Role of intericosahedral chains on the hardness of sputtered boron carbide films

International Nuclear Information System (INIS)

Jacobsohn, L.G.; Averitt, R.D.; Wetteland, C.J.; Schulze, R.K.; Nastasi, M.; Daemen, L.L.; Jenei, Z.; Asoka-Kumar, P.

2004-01-01

The relationship between the structure and mechanical properties of sputter-deposited boron carbide films was investigated. Changes in the structure induced by annealing were characterized in terms of chemical composition, chemical bonding, and concentrations of defects and trapped impurities. The creation of intericosahedral chains for higher annealing temperatures was revealed by infrared and Raman measurements, and the intensity of the infrared band at 1500 cm-1 was found to be related to the hardness. The presence of residual trapped Ar atoms and of open-volume defects is insensitive to relatively high annealing temperatures and does not influence the recovery of the hardness. Our results suggest postdeposition annealing as a pathway to enhance the mechanical properties of boron carbide films

Bifurcation magnetic resonance in films magnetized along hard magnetization axis

Energy Technology Data Exchange (ETDEWEB)

Vasilevskaya, Tatiana M., E-mail: t_vasilevs@mail.ru [Ulyanovsk State University, Leo Tolstoy 42, 432017 Ulyanovsk (Russian Federation); Sementsov, Dmitriy I.; Shutyi, Anatoliy M. [Ulyanovsk State University, Leo Tolstoy 42, 432017 Ulyanovsk (Russian Federation)

2012-09-15

We study low-frequency ferromagnetic resonance in a thin film magnetized along the hard magnetization axis performing an analysis of magnetization precession dynamics equations and numerical simulation. Two types of films are considered: polycrystalline uniaxial films and single-crystal films with cubic magnetic anisotropy. An additional (bifurcation) resonance initiated by the bistability, i.e. appearance of two closely spaced equilibrium magnetization states is registered. The modification of dynamic modes provoked by variation of the frequency, amplitude, and magnetic bias value of the ac field is studied. Both steady and chaotic magnetization precession modes are registered in the bifurcation resonance range. - Highlights: Black-Right-Pointing-Pointer An additional bifurcation resonance arises in a case of a thin film magnetized along HMA. Black-Right-Pointing-Pointer Bifurcation resonance occurs due to the presence of two closely spaced equilibrium magnetization states. Black-Right-Pointing-Pointer Both regular and chaotic precession modes are realized within bifurcation resonance range. Black-Right-Pointing-Pointer Appearance of dynamic bistability is typical for bifurcation resonance.

Bifurcation magnetic resonance in films magnetized along hard magnetization axis

International Nuclear Information System (INIS)

Vasilevskaya, Tatiana M.; Sementsov, Dmitriy I.; Shutyi, Anatoliy M.

2012-01-01

We study low-frequency ferromagnetic resonance in a thin film magnetized along the hard magnetization axis performing an analysis of magnetization precession dynamics equations and numerical simulation. Two types of films are considered: polycrystalline uniaxial films and single-crystal films with cubic magnetic anisotropy. An additional (bifurcation) resonance initiated by the bistability, i.e. appearance of two closely spaced equilibrium magnetization states is registered. The modification of dynamic modes provoked by variation of the frequency, amplitude, and magnetic bias value of the ac field is studied. Both steady and chaotic magnetization precession modes are registered in the bifurcation resonance range. - Highlights: ► An additional bifurcation resonance arises in a case of a thin film magnetized along HMA. ► Bifurcation resonance occurs due to the presence of two closely spaced equilibrium magnetization states. ► Both regular and chaotic precession modes are realized within bifurcation resonance range. ► Appearance of dynamic bistability is typical for bifurcation resonance.

Improvement of the Surface Hardness of Stainless Steel with the TitaniumCarbonitride Ti(CN) Thin Films

International Nuclear Information System (INIS)

Agus-Purwadi; Tri-Mardji Atmono; Widdi-Usada; Lely-Susita; Yunanto

2000-01-01

Fabrication of the T i (CN) thin films with methods of implantation and RFsputtering for improving the surfaces hardness of stainless steel (SS) hasbeen done. Some kinds of T i C thin films which made individually by varyingof RF sputtering power from 0 up to 160 watt are implanted by the nitrogenion beams on the doses and energy ion optimum of 6.107 x 10 17 ion/cm 2 and100 keV, also fabrication of T i (CN) thin films use RF sputtering method withT i target and reaction gases as argon, silene and nitrogen on the optimum ofsputtering parameter condition. The thin films yields are characterized byusing Microhardness Tester MX 170, obtained SS hardness which layered T i (CN)as 402.5 KHN from its initial of 215.54 KHN and 371.74 KHN (layered T i C), itmeans that the SS surface hardness improve 1.867 times cumulatively. From theX-Ray Diffraction (XRD) analysis yield showed that the microstructure ofT i (CN) films on the SS substrates are dominated by characteristic cubiccrystal structure with Miller plane orientation (111) on the scattering angleof 2 θ = 44 o . Morphology visualization of T i (CN) thin films crosssection on the SS substrate is realized by Spectroscopy Electron Microscope(SEM). (author)

Apparatus and process for deposition of hard carbon films

Science.gov (United States)

Nyaiesh, Ali R.; Garwin, Edward L.

1989-01-03

A process and an apparatus for depositing thin, amorphous carbon films having extreme hardness on a substrate is described. An enclosed chamber maintained at less than atmospheric pressure houses the substrate and plasma producing elements. A first electrode is comprised of a cavity enclosed within an RF coil which excites the plasma. A substrate located on a second electrode is excited by radio frequency power applied to the substrate. A magnetic field confines the plasma produced by the first electrode to the area away from the walls of the chamber and focuses the plasma onto the substrate thereby yielding film deposits having higher purity and having more rapid buildup than other methods of the prior art.

Exchange-coupled hard magnetic Fe-Co/CoPt nanocomposite films fabricated by electro-infiltration

Directory of Open Access Journals (Sweden)

Xiao Wen

2017-05-01

Full Text Available This paper introduces a potentially scalable electro-infiltration process to produce exchange-coupled hard magnetic nanocomposite thin films. Fe-Co/CoPt nanocomposite films are fabricated by deposition of CoFe2O4 nanoparticles onto Si substrate, followed by electroplating of CoPt. Samples are subsequently annealed under H2 to reduce the CoFe2O4 to magnetically soft Fe-Co and also induce L10 ordering in the CoPt. Resultant films exhibit 0.97 T saturation magnetization, 0.70 T remanent magnetization, 127 kA/m coercivity and 21.8 kJ/m3 maximum energy density. First order reversal curve (FORC analysis and δM plot are used to prove the exchange coupling between soft and hard magnetic phases.

Relationship between thin-film bond strength as measured by a scratch test, and indentation hardness for bonding agents.

Science.gov (United States)

Kusakabe, Shusuke; Rawls, H Ralph; Hotta, Masato

2016-03-01

To evaluate thin-film bond strength between a bonding agent and human dentin, using a scratch test, and the characteristics and accuracy of measurement. One-step bonding agents (BeautiBond; Bond Force; Adper Easy Bond; Clearfil tri-S Bond) and two-step bonding agents (Cleafil SE Bond; FL-Bond II) were investigated in this study. Flat dentin surfaces were prepared for extracted human molars. The dentin surfaces were ground and bonding agents were applied and light cured. The thin-film bond strength test of the specimens was evaluated by the critical load at which the coated bonding agent failed and dentin appeared. The scratch mark sections were then observed under a scanning electron microscope. Indentation hardness was evaluated by the variation in depth under an applied load of 10gf. Data were compared by one-way ANOVA with the Scheffé's post hoc multiple comparison test (pstrength and indentation hardness were analyzed using analysis of correlation and covariance. The thin-film bond strength of two-step bonding agents were found to be significantly higher than that of one-step bonding agents with small standard deviations. Scratch marks consistently showed adhesive failure in the vicinity of the bonding agent/dentin interface. The indentation hardness showed a trend that two-step bonding agents have greater hardness than one-step bonding agents. A moderately significant correlation (r(2)=0.31) was found between thin-film bond strength and indentation hardness. Thin-film bond strength test is a valid and reliable means of evaluating bond strength in the vicinity of the adhesive interface and is more accurate than other methods currently in use. Further, the thin-film bond strength is influenced by the hardness of the cued bonding agent. Copyright © 2015 Academy of Dental Materials. Published by Elsevier Ltd. All rights reserved.

Effect of deposition parameter on hardness of amorphous carbon film prepared by plasma immersion ion implantation using C2H2

International Nuclear Information System (INIS)

Mitsuo, A.; Uchida, S.; Morikawa, K.; Kawaguchi, M.; Shiotani, K.; Suzuki, H.

2007-01-01

Carbon films were deposited on a cemented carbide substrate and silicon wafer at various bias voltages, acetylene (C 2 H 2 ) pressures and process times by plasma immersion ion implantation (PIII). In order to investigate the substrate temperature, the tool steel substrate was also simultaneously treated. The final substrate temperature was estimated from the hardness of the tool steel substrate. The surface and cross-sectional morphology of the deposited films were observed using a scanning electron microscope (SEM). Depth profiles of the carbon were obtained by Auger electron spectroscopy (AES). Raman spectroscopy was employed for the structural evaluation of the films. The hardness of the deposited films was measured using a nano-indenter with the maximum load of 0.5 mN. A variety of film hardnesses between 10 to 24 GPa was obtained. The hardness of the carbon films decreased with the increasing bias voltage, C 2 H 2 pressure and process time, although the intensity ratio of the disordered peak to graphitic peak in the Raman spectrum increased. It was considered that the decrease in the film hardness was caused by a stress reduction accompanied by a heating effect during the process as each PIII process parameter significantly influenced the substrate temperature

Structure-phase composition and nano hardness of chrome-fullerite-chrome films irradiated by boron ions

International Nuclear Information System (INIS)

Baran, L.V.

2015-01-01

By methods of atomic force microscopy, X-ray diffraction and nano indentation the research of change of structure phase composition and nano hardness of the chrome - fullerite - chrome films, subjected to implantation by B + ions (E = 80 keV, F = 5*10 17 ions/cm 2 ) are submitted. It is established, that as a result of Boron ion implantation of the chrome - fullerite - chrome films, chrome and fullerite inter fusion on sues, that is the solid-phase interaction and as a result of which forms the heterophase with increased nano hardness. (authors)

Preparation and characterization of nanocrystalline composites Mo-C-N hard films

Energy Technology Data Exchange (ETDEWEB)

Liu, Q. [Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, POB 1129, 230031 Hefei (China); Liu, T. [Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, POB 1129, 230031 Hefei (China); Fang, Q.F. [Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, POB 1129, 230031 Hefei (China)]. E-mail: qffang@issp.ac.cn; Liang, F.J. [Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, POB 1129, 230031 Hefei (China); Wang, J.X. [Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, POB 1129, 230031 Hefei (China)

2006-05-01

Molybdenum carbonitride (MoCN) films were deposited on Si (001) and stainless steel substrates by reactive direct-current magnetron sputtering with a molybdenum and graphite composite target. By changing the substrate temperature and the N{sub 2} / Ar ratio in the sputtering gas, it is found that good quality MoCN films can be deposited at substrate temperature of 300-400 deg. C under N{sub 2} partial pressure of 0.25-0.5 Pa with a total working pressure of 1 Pa. The structures of the films deposited at such conditions were determined by X-ray diffraction and X-ray photoelectron spectroscopy analysis as nanocrystalline molybdenum carbonitride with a grain size of several ten nanometers was embedded in the amorphous matrix of C and CN {sub x}. The hardness of the MoCN films can reach 28 GPa, much higher than the value of MoC and MoN films alone.

Low Molecular Weight Z-Tetraol Boundary Lubricant Films in Hard Disk Drives

Directory of Open Access Journals (Sweden)

R. J. Waltman

2012-01-01

Full Text Available Lower molecular weight Z-Tetraol films exhibit increased mechanical spacing in the slider-disk interface due to a lower z-profile. An increased resistance to lubricant disturbance on the disk surface (e.g., lube moguls with decreasing film thickness is attributed to an increasing contribution from the polar component of the disjoining pressure. Evaporative loss at temperatures typically encountered in a hard-disk drive also increases with decreasing molecular weight but is strongly dependent on the initial bonded fraction.

Hard TiCx/SiC/a-C:H nanocomposite thin films using pulsed high energy density plasma focus device

International Nuclear Information System (INIS)

Umar, Z.A.; Rawat, R.S.; Tan, K.S.; Kumar, A.K.; Ahmad, R.; Hussain, T.; Kloc, C.; Chen, Z.; Shen, L.; Zhang, Z.

2013-01-01

Highlights: •The energetic ions and electron beams are used to synthesize TiC x /SiC/a-C:H films. •As-deposited crystalline and hard nanocomposite TiC x /SiC/a-C:H films are synthesized. •Very high average deposition rates of 68 nm/shot are achieved using dense plasma focus. •The maximum hardness of 22 GPa is achieved at the surface of the film. -- Abstract: Thin films of TiC x /SiC/a-C:H were synthesized on Si substrates using a complex mix of high energy density plasmas and instability accelerated energetic ions of filling gas species, emanated from hot and dense pinched plasma column, in dense plasma focus device. The conventional hollow copper anode of Mather type plasma focus device was replaced by solid titanium anode for synthesis of TiC x /SiC/a-C:H nanocomposite thin films using CH 4 :Ar admixture of (1:9, 3:7 and 5:5) for fixed 20 focus shots as well as with different number of focus shots with fixed CH 4 :Ar admixture ratio 3:7. XRD results showed the formation of crystalline TiC x /SiC phases for thin film synthesized using different number of focus shots with CH 4 :Ar admixture ratio fixed at 3:7. SEM results showed that the synthesized thin films consist of nanoparticle agglomerates and the size of agglomerates depended on the CH 4 :Ar admixture ratio as well as on the number of focus shots. Raman analysis showed the formation of polycrystalline/amorphous Si, SiC and a-C for different CH 4 :Ar ratio as well as for different number of focus shots. The XPS analysis confirmed the formation of TiC x /SiC/a-C:H composite thin film. Nanoindentation results showed that the hardness and elastic modulus values of composite thin films increased with increasing number of focus shots. Maximum values of hardness and elastic modulus at the surface of the composite thin film were found to be about 22 and 305 GPa, respectively for 30 focus shots confirming the successful synthesis of hard composite TiC x /SiC/a-C:H coatings

Materials and Manufacturing Processing; Special Issue on Hard Carbon Films

Science.gov (United States)

1993-01-01

AZ 85721 G. SMOLIK, P.O. Box 1625, Idaho National Engineering Laboratory, Idaho Falls, ID 83415 J.B. TERRELL, Reynolds Metals Company, P.O. Box 27003 ...18%Si alloy using inserts of ISO SPGN120308 and HEHN532FN. The damage to diamond films after cutting was examined by SEM and micro-laser Raman...uncoated cemented carbide insert corresponding to ISO K10 grade and sintered diamond insert were also used. Milling a hard carbon under dry condition The

Epitaxial Growth of Hard Ferrimagnetic Mn3Ge Film on Rhodium Buffer Layer

Directory of Open Access Journals (Sweden)

Atsushi Sugihara

2015-06-01

Full Text Available Mn\\(_3\\Ge has a tetragonal Heusler-like D0\\(_{22}\\ crystal structure, exhibiting a large uniaxial magnetic anisotropy and small saturation magnetization due to its ferrimagnetic spin structure; thus, it is a hard ferrimagnet. In this report, epitaxial growth of a Mn\\(_3\\Ge film on a Rh buffer layer was investigated for comparison with that of a film on a Cr buffer layer in terms of the lattice mismatch between Mn\\(_3\\Ge and the buffer layer. The film grown on Rh had much better crystalline quality than that grown on Cr, which can be attributed to the small lattice mismatch. Epitaxial films of Mn\\(_3\\Ge on Rh show somewhat small coercivity (\\(H_{\\rm c}\\ = 12.6 kOe and a large perpendicular magnetic anisotropy (\\(K_{\\rm u}\\ = 11.6 Merg/cm\\(^3\\, comparable to that of the film grown on Cr.

Ultrahigh hardness and high electrical resistivity in nano-twinned, nanocrystalline high-entropy alloy films

Science.gov (United States)

Huo, Wenyi; Liu, Xiaodong; Tan, Shuyong; Fang, Feng; Xie, Zonghan; Shang, Jianku; Jiang, Jianqing

2018-05-01

Nano-twinned, nanocrystalline CoCrFeNi high-entropy alloy films were produced by magnetron sputtering. The films exhibit a high hardness of 8.5 GPa, the elastic modulus of 161.9 GPa and the resistivity as high as 135.1 μΩ·cm. The outstanding mechanical properties were found to result from the resistance of deformation created by nanocrystalline grains and nano-twins, while the electrical resistivity was attributed to the strong blockage effect induced by grain boundaries and lattice distortions. The results lay a solid foundation for the development of advanced films with structural and functional properties combined in micro-/nano-electronic devices.

Hard electronics; Hard electronics

Energy Technology Data Exchange (ETDEWEB)

NONE

1997-03-01

Hard material technologies were surveyed to establish the hard electronic technology which offers superior characteristics under hard operational or environmental conditions as compared with conventional Si devices. The following technologies were separately surveyed: (1) The device and integration technologies of wide gap hard semiconductors such as SiC, diamond and nitride, (2) The technology of hard semiconductor devices for vacuum micro- electronics technology, and (3) The technology of hard new material devices for oxides. The formation technology of oxide thin films made remarkable progress after discovery of oxide superconductor materials, resulting in development of an atomic layer growth method and mist deposition method. This leading research is expected to solve such issues difficult to be easily realized by current Si technology as high-power, high-frequency and low-loss devices in power electronics, high temperature-proof and radiation-proof devices in ultimate electronics, and high-speed and dense- integrated devices in information electronics. 432 refs., 136 figs., 15 tabs.

On indentation and scratching of thin films on hard substrates

International Nuclear Information System (INIS)

Larsson, Per-Lennart; Wredenberg, Fredrik

2008-01-01

Indentation and scratching of thin film/substrate structures, using sharp conical indenters, are studied theoretically and numerically and discussed in particular with material characterization in mind. For simplicity, but not out of necessity, the material behaviour is described by classical elastoplasticity accounting for large deformations. Explicit material parameters are chosen in order to arrive at representative results as regards material behaviour and indenter geometry. The main efforts are devoted towards an understanding of the influence from the film/substrate boundary on global indentation (scratching) properties at different material combinations. Global quantities to be investigated include indentation and scratching hardness, contact area and apparent coefficient of friction at scratching. A comparison of the mechanical behaviour at normal indentation and at scratching is also included. In addition, the behaviour of different field variables is studied and in this case the discussion is focused on fracture initiation governed by a critical stress criterion. The numerical investigation is performed using the finite element method and the numerical strategy is discussed in some detail. Throughout the analysis it is assumed that the substrate is considerably harder than the indented film and consequently the deformation of the substrate is neglected

High resolution hard X-ray photoemission using synchrotron radiation as an essential tool for characterization of thin solid films

International Nuclear Information System (INIS)

Kim, J.J.; Ikenaga, E.; Kobata, M.; Takeuchi, A.; Awaji, M.; Makino, H.; Chen, P.P.; Yamamoto, A.; Matsuoka, T.; Miwa, D.; Nishino, Y.; Yamamoto, T.; Yao, T.; Kobayashi, K.

2006-01-01

Recently, we have shown that hard X-ray photoemission spectroscopy using undulator X-rays at SPring-8 is quite feasible with both high resolution and high throughput. Here we report an application of hard X-ray photoemission spectroscopy to the characterization of electronic and chemical states of thin solid films, for which conventional PES is not applicable. As a typical example, we focus on the problem of the scatter in the reported band-gap values for InN. We show that oxygen incorporation into the InN film strongly modifies the valence and plays a crucial role in the band gap problem. The present results demonstrate the powerful applicability of high resolution photoemission spectroscopy with hard X-rays from a synchrotron source

Thin-film-based scintillators for hard x-ray microimaging detectors: the ScinTAX Project

Science.gov (United States)

Rack, A.; Cecilia, A.; Douissard, P.-A.; Dupré, K.; Wesemann, V.; Baumbach, T.; Couchaud, M.; Rochet, X.; Riesemeier, H.; Radtke, M.; Martin, T.

2014-09-01

The project ScinTAX developed novel thin scintillating films for the application in high performance X-ray imaging and subsequent introduced new X-ray detectors to the market. To achieve this aim lutetium orthosilicate (LSO) scintillators doped with different activators were grown successfully by liquid phase epitaxy. The high density of LSO (7.4 g/cm3), the effective atomic number (65.2) and the high light yield make this scintillator highly applicable for indirect X-ray detection in which the ionizing radiation is converted into visible light and then registered by a digital detector. A modular indirect detection system has been developed to fully exploit the potential of this thin film scintillator for radiographic and tomographic imaging. The system is compatible for high-resolution imaging with moderate dose as well as adaptable to intense high-dose applications where radiation hard microimaging detectors are required. This proceedings article shall review the achieved performances and technical details on this high-resolution detector system which is now available. A selected example application demonstrates the great potential of the optimized detector system for hard X-ray microimaging, i.e. either to improve image contrast due to the availability of efficient thin crystal films or to reduce the dose to the sample.

Plastic properties of thin films on substrates as measured by submicron indentation hardness and substrate curvature techniques

International Nuclear Information System (INIS)

Doerner, M.F.; Gardner, D.S.; Nix, W.D.

1986-01-01

Substrate curvature and submicron indentation measurements have been used recently to study plastic deformation in thin films on substrates. In the present work both of these techniques have been employed to study the strength of aluminum and tungsten thin films on silicon substrates. In the case of aluminum films on silicon substrates, the film strength is found to increase with decreasing thickness. Grain size variations with film thickness do not account for the variations in strength. Wafer curvature measurements give strengths higher than those predicted from hardness measurements suggesting the substrate plays a role in strengthening the film. The observed strengthening effect with decreased thickness may be due to image forces on dislocations in the film due to the elastically stiffer silicon substrate. For sputtered tungsten films, where the substrate is less stiff than the film, the film strength decreases with decreasing film thickness

X-ray magnetic circular dichroism and hard X-ray photoelectron spectroscopy of tetragonal Mn72Ge28 epitaxial thin film

Science.gov (United States)

Kim, Jinhyeok; Mizuguchi, Masaki; Inami, Nobuhito; Ueno, Tetsuro; Ueda, Shigenori; Takanashi, Koki

2018-04-01

An epitaxially grown Mn72Ge28 film with a tetragonal crystal structure was fabricated. It was clarified that the film had a perpendicular magnetization and a high perpendicular magnetic anisotropy energy of 14.3 Merg/cm3. The electronic structure was investigated by X-ray magnetic circular dichroism and hard X-ray photoelectron spectroscopy. The obtained X-ray magnetic circular dichroism spectrum revealed that the Mn orbital magnetic moment governed the magnetocrystalline anisotropy of the Mn72Ge28 film. A doublet structure was observed for the Mn 2p3/2 peak of hard X-ray photoelectron spectrum, indicating the spin exchange interaction between the 2p core-hole and 3d valence electrons.

Mechanical design of thin-film diamond crystal mounting apparatus for coherence preservation hard x-ray optics

International Nuclear Information System (INIS)

Shu, Deming; Shvyd’ko, Yuri V.; Stoupin, Stanislav; Kim, Kwang-Je

2016-01-01

A new thin-film diamond crystal mounting apparatus has been designed at the Advanced Photon Source (APS) for coherence preservation hard x-ray optics with optimized thermal contact and minimized crystal strain. This novel mechanical design can be applied to new development in the field of: x-ray optics cavities for hard x-ray free-electron laser oscillators (XFELOs), self-seeding monochromators for hard x-ray free-electron laser (XFEL) with high average thermal loading, high heat load diamond crystal monochromators and beam-sharing/beam-split-and-delay devices for XFEL facilities and future upgraded high-brightness coherent x-ray source in the MBA lattice configuration at the APS.

Mechanical design of thin-film diamond crystal mounting apparatus for coherence preservation hard x-ray optics

Energy Technology Data Exchange (ETDEWEB)

Shu, Deming, E-mail: shu@aps.anl.gov; Shvyd’ko, Yuri V.; Stoupin, Stanislav; Kim, Kwang-Je [Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, U.S.A (United States)

2016-07-27

A new thin-film diamond crystal mounting apparatus has been designed at the Advanced Photon Source (APS) for coherence preservation hard x-ray optics with optimized thermal contact and minimized crystal strain. This novel mechanical design can be applied to new development in the field of: x-ray optics cavities for hard x-ray free-electron laser oscillators (XFELOs), self-seeding monochromators for hard x-ray free-electron laser (XFEL) with high average thermal loading, high heat load diamond crystal monochromators and beam-sharing/beam-split-and-delay devices for XFEL facilities and future upgraded high-brightness coherent x-ray source in the MBA lattice configuration at the APS.

Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering

Czech Academy of Sciences Publication Activity Database

Vlček, J.; Steidl, P.; Kohout, J.; Čerstvý, R.; Zeman, P.; Prokšová, S.; Peřina, Vratislav

2013-01-01

Roč. 215, JAN 25 (2013), s. 186-191 ISSN 0257-8972. [39th International Conference on Metallurgical Coatings and Thin Films (ICMTF). San Diego, California, 23.04.2012-27.04.2012] Institutional support: RVO:61389005 Keywords : Zr-B-C-N films * nanocomposite materials * pulsed magnetron sputtering * hard ness * high electrical conductivity * osidation resistance Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 2.199, year: 2013 http://www.sciencedirect.com/science/article/pii/S0257897212010584

Coercivity in SmCo hard magnetic films for MEMS applications

Energy Technology Data Exchange (ETDEWEB)

Pina, E. [Instituto de Magnetismo Aplicado, RENFE-UCM, Universidad Complutense de Madrid, P.O. Box 155, 28230 Las Rozas, Madrid (Spain)]. E-mail: epina@renfe.es; Palomares, F.J. [Instituto de Ciencia de Materiales de Madrid-CSIC, c/ Sor Juana Ines de la Cruz s/n, 28049 Madrid (Spain); Garcia, M.A. [Instituto de Magnetismo Aplicado, RENFE-UCM, Universidad Complutense de Madrid, P.O. Box 155, 28230 Las Rozas, Madrid (Spain); Cebollada, F. [Departamento de Fisica Aplicada a las Telecomunicaciones, EUITT-UPM, Crtra. De Valencia km 7, 28031 Madrid (Spain); Hoyos, A. de [Instituto de Magnetismo Aplicado, RENFE-UCM, Universidad Complutense de Madrid, P.O. Box 155, 28230 Las Rozas, Madrid (Spain); Romero, J.J. [Instituto de Magnetismo Aplicado, RENFE-UCM, Universidad Complutense de Madrid, P.O. Box 155, 28230 Las Rozas, Madrid (Spain); Hernando, A. [Instituto de Magnetismo Aplicado, RENFE-UCM, Universidad Complutense de Madrid, P.O. Box 155, 28230 Las Rozas, Madrid (Spain); Unidad asociada ICMM-IMA. P.O. Box 155, 28230 Las Rozas Madrid (Spain); Gonzalez, J.M. [Unidad asociada ICMM-IMA. P.O. Box 155, 28230 Las Rozas Madrid (Spain)

2005-04-15

In this work we have investigated the thermal dependence of coercivity in 1.5 {mu}m thick SmCo{sub 5} films fabricated by sputtering technique. Samples were deposited onto Si substrates kept at different temperatures. Samples grown below 450 deg. C are amorphous, present low coercivity and require further crystallization processes in order to obtain the 1:5 SmCo hard phase. Samples grown at 450 deg. C are nanocrystalline in the as-deposited state and exhibit high room temperature in-plane coercivity. Correlation between the thermal dependence of coercivity and the nanostructure has been analyzed in the frame of the so-called micromagnetic model.

Coercivity in SmCo hard magnetic films for MEMS applications

International Nuclear Information System (INIS)

Pina, E.; Palomares, F.J.; Garcia, M.A.; Cebollada, F.; Hoyos, A. de; Romero, J.J.; Hernando, A.; Gonzalez, J.M.

2005-01-01

In this work we have investigated the thermal dependence of coercivity in 1.5 μm thick SmCo 5 films fabricated by sputtering technique. Samples were deposited onto Si substrates kept at different temperatures. Samples grown below 450 deg. C are amorphous, present low coercivity and require further crystallization processes in order to obtain the 1:5 SmCo hard phase. Samples grown at 450 deg. C are nanocrystalline in the as-deposited state and exhibit high room temperature in-plane coercivity. Correlation between the thermal dependence of coercivity and the nanostructure has been analyzed in the frame of the so-called micromagnetic model

Obtention of high hardness multilayer systems by laser ablation

International Nuclear Information System (INIS)

Mejia T, I.S.

2007-01-01

In this thesis work the synthesis of thin films of titanium nitride (TiN), amorphous carbon nitride (CN x ) amorphous carbon (a-C) and Ti/TiN/CNx multilayers and Ti/TiN/a-C by means of the laser ablation technique, with the objective of obtaining films of high hardness is studied, as well as to produce multilayer coatings with superior properties to the individual layers. The effect that has the laser fluence used for ablationing the targets in the structure and mechanical properties of the films deposited of TiN was investigated. It was found that the hardness is increased in lineal way approximately with the fluence increment up to 19 J/cm 2 . Thin films of a-C with hardness of the order of 12 GPa. likewise CN x films with high hardness (18.4 GPa) were obtained. The hardness of the deposited films was analyzed and it was related with its microstructure and deposit conditions. It was concluded that the Ti/TiN/CNx and Ti/TiN/a-C systems presented bigger hardness that of its individual components. (Author)

Nanoindentation of ultra-hard cBN films: A molecular dynamics study

Energy Technology Data Exchange (ETDEWEB)

Huang, Cheng [College of Aerospace Engineering, Chongqing University, Chongqing 400044 (China); Peng, Xianghe, E-mail: xhpeng@cqu.edu.cn [College of Aerospace Engineering, Chongqing University, Chongqing 400044 (China); State Key Laboratory of Coal Mine Disaster Dynamics and Control, Chongqing University, Chongqing 400044 (China); Chongqing Key Laboratory of Heterogeneous Material Mechanics, Chongqing University, Chongqing 400044 (China); Fu, Tao, E-mail: futaocqu@163.com [College of Aerospace Engineering, Chongqing University, Chongqing 400044 (China); Zhao, Yinbo; Feng, Chao; Lin, Zijun [College of Aerospace Engineering, Chongqing University, Chongqing 400044 (China); Li, Qibin [College of Aerospace Engineering, Chongqing University, Chongqing 400044 (China); Chongqing Key Laboratory of Heterogeneous Material Mechanics, Chongqing University, Chongqing 400044 (China)

2017-01-15

Highlights: • We optimize tersoff potential to better simulate the BN. • We perform respectively the nanoindentations on the (001) and (111) surface of cBN. • The main slip system of cBN under nanoindentation is {111}<110>. • Temperature has a significant effect on the mechanical properties of cBN. - Abstract: Cubic Boron nitride (cBN) exhibits excellent mechanical properties including high strength, hardness and thermal resistance, etc. We optimized the parameters in the Tersoff interatomic potential for cBN based on its cohesive energy, lattice parameter, elastic constants, surface energy and stacking fault energy. We performed with molecular dynamics (MD) simulations the nanoindentation on the (001) and (111) surface of monocrystalline cBN thin films to study the deformation mechanisms and the effects of temperature and substrate orientation. It was found that during the indentation plastic deformation is mainly stress-induced slips of dislocations along {111}<110> orientations. It was also found that the hardness of cBN depends strongly on temperature, and the capability of plastic deformation is enhanced with the increase of temperature.

Film-Screen Mammography versus digital storage plate mammography: Hard copy and monitor display of microcalcifications and focal findings - A retrospective clinical and histologic analysis

International Nuclear Information System (INIS)

Schulz-Wendtland, R.; Wenkel, E.; Aichinger, U.; Tartsch, M.; Kuchar, I.; Bautz, W.

2003-01-01

Purpose: A retrospective clinical-histological study to determine the diagnostic accuracy of mammography using conventional screen-film cassettes (hard copy), high-resolution digital phosphor storage plates (hard copy) and monitor display (soft copy) for microcalcifications and focal lesions (BI-RADS TM category 4 or 5). Materials and methods: From April to November 2001, 76 patients underwent conventional film-screen mammography and, after diagnosis and preoperative wire localization, digital mammography with the same exposure parameters. Five investigators retrospectively determined the diagnosis after the operation from randomly distributed mediolateral views (hard-copy reading) and from the monitor display (soft-copy reading). These results were correlated with the final histology. Results: The accuracy of conventional screen-film mammography, digital mammography and monitor-displayed mammography was 67%, 65% and 68% for all findings, (n = 76), 59%, 59% and 68% for microcalcifications (n = 44) and 75%, 72% and 63% for focal lesions (n = 32). The overall results showed no difference. Conclusions: Our findings indicate equivalence of conventional screen-film mammography, high-resolution digital phosphor storage plate mammography and monitor-displayed mammography. (orig.) [de

Enhanced lubricant film formation through micro-dimpled hard-on-hard artificial hip joint: An in-situ observation of dimple shape effects.

Science.gov (United States)

Choudhury, Dipankar; Rebenda, David; Sasaki, Shinya; Hekrle, Pavel; Vrbka, Martin; Zou, Min

2018-05-01

This study evaluates the impact of dimple shapes on lubricant film formation in artificial hip joints. Micro-dimples with 20-50 µm lateral size and 1 ± 0.2 µm depths were fabricated on CrCoMo hip joint femoral heads using a picosecond laser. Tribological studies were performed using a pendulum hip joint simulator to apply continuous swing flexion-extension motions. The results revealed a significantly enhanced lubricant film thickness (≥ 500 nm) with micro-dimpled prosthesis heads at equilibrium position after the lubricant film has fully developed. The average lubricant film thickness of dimpled prostheses with square- and triangular-shaped dimple arrays over time is about 3.5 that of the non-dimpled prosthesis (204 nm). Remarkably, the prosthesis with square-shaped dimple arrays showed a very fast lubricant film formation reaching their peak values within 0.5 s of pendulum movement, followed by prosthesis with triangular-shaped dimple arrays with a transition period of 42.4 s. The fully developed lubricant film thicknesses (≥ 700 nm) are significantly higher than the surface roughness (≈ 25 nm) demonstrating a hydrodynamic lubrication. Hardly any scratches appeared on the post-experimental prosthesis with square-shaped dimple array and only a few scratches were found on the post-experimental prosthesis with triangular-shaped dimple arrays. Thus, prostheses with square-shaped dimple arrays could be a potential solution for durable artificial hip joints. Copyright © 2018 Elsevier Ltd. All rights reserved.

Effects of thermal annealing on the structural, mechanical, and tribological properties of hard fluorinated carbon films deposited by plasma enhanced chemical vapor deposition

Science.gov (United States)

Maia da Costa, M. E. H.; Baumvol, I. J. R.; Radke, C.; Jacobsohn, L. G.; Zamora, R. R. M.; Freire, F. L.

2004-11-01

Hard amorphous fluorinated carbon films (a-C:F) deposited by plasma enhanced chemical vapor deposition were annealed in vacuum for 30 min in the temperature range of 200-600 °C. The structural and compositional modifications were followed by several analytical techniques: Rutherford backscattering spectrometry (RBS), elastic recoil detection analysis (ERDA), x-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. Nanoidentation measurements and lateral force microscopy experiments were carried out in order to provide the film hardness and the friction coefficient, respectively. The internal stress and contact angle were also measured. RBS, ERDA, and XPS results indicate that both fluorine and hydrogen losses occur for annealing temperatures higher than 300 °C. Raman spectroscopy shows a progressive graphitization upon annealing, while the surface became slightly more hydrophobic as revealed by the increase of the contact angle. Following the surface wettability reduction, a decrease of the friction coefficient was observed. These results highlight the influence of the capillary condensation on the nanoscale friction. The film hardness and the internal stress are constant up to 300 °C and decrease for higher annealing temperatures, showing a direct correlation with the atomic density of the films. Since the thickness variation is negligible, the mass loss upon thermal treatment results in amorphous structures with a lower degree of cross-linking, explaining the deterioration of the mechanical properties of the a-C:F films.

Enhanced hardness in epitaxial TiAlScN alloy thin films and rocksalt TiN/(Al,Sc)N superlattices

Energy Technology Data Exchange (ETDEWEB)

Saha, Bivas [School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907 (United States); Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907 (United States); Lawrence, Samantha K.; Bahr, David F. [School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907 (United States); Schroeder, Jeremy L.; Birch, Jens [Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Sands, Timothy D. [School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907 (United States); Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907 (United States); School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907 (United States)

2014-10-13

High hardness TiAlN alloys for wear-resistant coatings exhibit limited lifetimes at elevated temperatures due to a cubic-AlN to hexagonal-AlN phase transformation that leads to decreasing hardness. We enhance the hardness (up to 46 GPa) and maximum operating temperature (up to 1050 °C) of TiAlN-based coatings by alloying with scandium nitride to form both an epitaxial TiAlScN alloy film and epitaxial rocksalt TiN/(Al,Sc)N superlattices on MgO substrates. The superlattice hardness increases with decreasing period thickness, which is understood by the Orowan bowing mechanism of the confined layer slip model. These results make them worthy of additional research for industrial coating applications.

Atomically Smooth Epitaxial Ferroelectric Thin Films for the Development of a Nonvolatile, Ultrahigh Density, Fast, Low Voltage, Radiation-Hard Memory

National Research Council Canada - National Science Library

Ahn, Charles H

2006-01-01

The goal of this research is to fabricate atomically smooth, single crystalline, complex oxide thin film nanostructures for use in a nonvolatile, ultrahigh density, fast, low voltage, radiation-hard memory...

A comparison of field-only electronic portal imaging hard copies with double exposure port films in radiation therapy treatment setup confirmation to determine its clinical application in a radiotherapy center

International Nuclear Information System (INIS)

Hatherly, Kay; Smylie, Josephine; Rodger, Alan

1999-01-01

Purpose: To determine in which treatment sites field-only hard copy electronic portal images (EPI) captured during a treatment exposure could replace traditional double exposed port films in a busy radiation oncology department. Methods and Materials: The three linear accelerators in the William Buckland Radiotherapy Centre (WBRC) at the Alfred Hospital in Melbourne are each equipped with an electronic portal imaging device (EPID). These devices can be used daily on all patients where the treatment fields are within the size constraint of the cassette, for example, less than 25 x 25 cm. Port films using radiographic film in hard cassettes were previously considered the standard method of field placement verification. After the radiation therapists were trained in all program aspects of capturing, enhancing, and producing hard copies of EPIs, a study was developed to evaluate the possibility of replacing port films with EPI hard copies within the established departmental procedures. Comparison of EPI hard copy with the simulator film and the port film of the same field was carried out by the radiation oncologist specialists. Seventy-eight comparison sets were generated and grouped into seven anatomical regions for evaluation by the radiation oncologist specialist responsible for each particular region. The outcome decision was the preferred imaging option. Where no preference was stated, EPI became the modality of choice, as it increased the efficiency of work practice. Results: The results indicate that field-only EPI can be considered to be at least as clinically useful for treatment verification in the following sites: breast, chest, hip, spine, and large pelvic fields. Port films using a standard, double exposure technique were considered necessary for partial brain fields, small pelvis fields, extremities, and radical head and neck fields. Conclusion: The quality of field-only images captured using an EPID has been favorably assessed to be equivalent to, or an

The effects of beam energy and substrate temperature on the tribological properties of hard-carbon films on aluminum

International Nuclear Information System (INIS)

Wei, R.; Wilbur, P.J.; Erdemir, A.; Kustas, F.M.

1992-01-01

Hard-carbon films were applied on flat 6061-T6 aluminum substrates using a broad-beam ion source operating on methane and producing carbonaceous ions with energies that varied from 250 to 1050 eV. Films were evaluated using a reciprocating alumina ball-on-flat sliding wear tester operating in an ambient air test environment. The films facilitated substantial reductions in friction coefficients to 0.08-0.2 from 0.4-0.7 for uncoated aluminum. At a sufficiently high normal load, the films failed and friction coefficients increased to the higher range. The best film caused this critical normal load to increase from less than 0.1 N for untreated aluminum to greater than 30 N. A near-optimal beam ion energy (450 eV) was identified for good quality films. At lower energies (e.g. 250 eV) films were discontinuous, while at higher energies (e.g. 1050 eV) high sputter rates limited film growth. When an aluminum flat was held at low temperature during processing, the films were smooth and adhered well, but they became rougher and adhered poorly as the temperature was increased above approximately 300degC. (orig.)

Investigation of the near-surface structures of polar InN films by chemical-state-discriminated hard X-ray photoelectron diffraction

International Nuclear Information System (INIS)

Yang, A. L.; Yamashita, Y.; Kobata, M.; Yoshikawa, H.; Sakata, O.; Kobayashi, K.; Matsushita, T.; Píš, I.; Imura, M.; Yamaguchi, T.; Nanishi, Y.

2013-01-01

Near-surface structures of polar InN films were investigated by laboratory-based hard X-ray photoelectron diffraction (HXPD) with chemical-state-discrimination. HXPD patterns from In 3d 5/2 and N 1s core levels of the In-polar and N-polar InN films were different from each other and compared with the simulation results using a multiple-scattering cluster model. It was found that the near-surface structure of the In-polar InN film was close to the ideal wurtzite structure. On the other hand, on the N-polar InN film, defects-rich surface was formed. In addition, the existence of the In-polar domains was observed in the HXPD patterns.

Hard Coat Layers by PE-CVD Process for the Top Surface of Touch Panel

International Nuclear Information System (INIS)

Okunishi, T; Sato, N; Yazawa, K

2013-01-01

In order to protect surface from damages, the high pencil hardness and the high abrasion resistance are required for the hard coat layers on polyethylene telephthalate (PET) films for the application of touch panel surface. We have already found that the UV-curing-hard-coat-polymer (UHP) coated PET films show the poor abrasion resistance, while they have the high pencil hardness. It reveals that the abrasion resistance of hard coat layers of the UHP is not simply dependent on the pencil hardness. In this work, we have studied to improve the abrasion resistance of SiOC films as hard coat layers, which were formed by PE-CVD process on UHP coated PET. The abrasion resistance was evaluated by Taber abrasion test. PE-CVD hard coat layers which formed on UHP coater PET films have showed the better abrasion resistance and have the possibility of substitution to the thin glass sheets for touch panel application.

Indentation modulus and hardness of viscoelastic thin films by atomic force microscopy: A case study

International Nuclear Information System (INIS)

Passeri, D.; Bettucci, A.; Biagioni, A.; Rossi, M.; Alippi, A.; Tamburri, E.; Lucci, M.; Davoli, I.; Berezina, S.

2009-01-01

We propose a nanoindentation technique based on atomic force microscopy (AFM) that allows one to deduce both indentation modulus and hardness of viscoelastic materials from the force versus penetration depth dependence, obtained by recording the AFM cantilever deflection as a function of the sample vertical displacement when the tip is pressed against (loading phase) and then removed from (unloading phase) the surface of the sample. Reliable quantitative measurements of both indentation modulus and hardness of the investigated sample are obtained by calibrating the technique through a set of different polymeric samples, used as reference materials, whose mechanical properties have been previously determined by standard indentation tests. By analyzing the dependence of the cantilever deflection versus time, the proposed technique allows one to evaluate and correct the effect of viscoelastic properties of the investigated materials, by adapting a post-experiment data processing procedure well-established for standard depth sensing indentation tests. The technique is described in the case of the measurement of indentation modulus and hardness of a thin film of poly(3,4-ethylenedioxythiophene) doped with poly(4-styrenesulfonate), deposited by chronoamperometry on an indium tin oxide (ITO) substrate.

Indentation modulus and hardness of viscoelastic thin films by atomic force microscopy: A case study

Energy Technology Data Exchange (ETDEWEB)

Passeri, D., E-mail: daniele.passeri@uniroma1.it [Dipartimento di Energetica, Universita di Roma ' La Sapienza' , Via A. Scarpa 16, 00161 Roma (Italy); Bettucci, A.; Biagioni, A.; Rossi, M.; Alippi, A. [Dipartimento di Energetica, Universita di Roma ' La Sapienza' , Via A. Scarpa 16, 00161 Roma (Italy); Tamburri, E. [Dipartimento di Scienze e Tecnologie Chimiche, Universita di Roma ' Tor Vergata' , Via della Ricerca Scientifica, 00133 Roma (Italy); Lucci, M.; Davoli, I. [Dipartimento di Fisica, Universita di Roma ' Tor Vergata' , Via della Ricerca Scientifica, 00133 Roma (Italy); Berezina, S. [Department of Physics, University of Zilina, 01026, Univerzitna 1 Zilina (Slovakia)

2009-11-15

We propose a nanoindentation technique based on atomic force microscopy (AFM) that allows one to deduce both indentation modulus and hardness of viscoelastic materials from the force versus penetration depth dependence, obtained by recording the AFM cantilever deflection as a function of the sample vertical displacement when the tip is pressed against (loading phase) and then removed from (unloading phase) the surface of the sample. Reliable quantitative measurements of both indentation modulus and hardness of the investigated sample are obtained by calibrating the technique through a set of different polymeric samples, used as reference materials, whose mechanical properties have been previously determined by standard indentation tests. By analyzing the dependence of the cantilever deflection versus time, the proposed technique allows one to evaluate and correct the effect of viscoelastic properties of the investigated materials, by adapting a post-experiment data processing procedure well-established for standard depth sensing indentation tests. The technique is described in the case of the measurement of indentation modulus and hardness of a thin film of poly(3,4-ethylenedioxythiophene) doped with poly(4-styrenesulfonate), deposited by chronoamperometry on an indium tin oxide (ITO) substrate.

Tensile stress in hard metal films

NARCIS (Netherlands)

Janssen, G.C.A.M.; Dammers, A.J.; Sivel, V.G.M.; Wang, W.R.

2003-01-01

Thin films on substrates are usually in a stressed state. An important, but trivial, contribution to that stress stems from the difference in thermal expansion coefficient of substrate and film. Much more interesting are the intrinsic stresses, resulting from the growth and/or microstructure of the

Broad-band hard X-ray reflectors

DEFF Research Database (Denmark)

Joensen, K.D.; Gorenstein, P.; Hoghoj, P.

1997-01-01

Interest in optics for hard X-ray broad-band application is growing. In this paper, we compare the hard X-ray (20-100 keV) reflectivity obtained with an energy-dispersive reflectometer, of a standard commercial gold thin-film with that of a 600 bilayer W/Si X-ray supermirror. The reflectivity...... of the multilayer is found to agree extraordinarily well with theory (assuming an interface roughness of 4.5 Angstrom), while the agreement for the gold film is less, The overall performance of the supermirror is superior to that of gold, extending the band of reflection at least a factor of 2.8 beyond...... that of the gold, Various other design options are discussed, and we conclude that continued interest in the X-ray supermirror for broad-band hard X-ray applications is warranted....

Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

Energy Technology Data Exchange (ETDEWEB)

Shimizu, Tetsuhide, E-mail: simizu-tetuhide@tmu.ac.jp [Division of Human Mechatronics Systems, Graduate School of System Design, Tokyo Metropolitan University, 6-6, Asahigaoka, Hino-shi, 191-0065 Tokyo (Japan); Teranishi, Yoshikazu; Morikawa, Kazuo; Komiya, Hidetoshi; Watanabe, Tomotaro; Nagasaka, Hiroshi [Surface Finishing Technology Group, Tokyo Metropolitan Industrial Technology Research Institute, 2-4-10, Aomi, Kohtoh-ku, 135-0064 Tokyo (Japan); Yang, Ming [Division of Human Mechatronics Systems, Graduate School of System Design, Tokyo Metropolitan University, 6-6, Asahigaoka, Hino-shi, 191-0065 Tokyo (Japan)

2015-04-30

(Ti,Al)N films were deposited from a Ti{sub 0.33}Al{sub 0.67} alloy target with a high Al content at a substrate temperature of less than 150 °C using high power impulse magnetron sputtering (HIPIMS) plasma. The pulse duration was varied from 60 to 300 μs with a low frequency of 333 Hz to investigate the effects on the dynamic variation of the substrate temperature, microstructural grain growth and the resulting mechanical properties. The chemical composition, surface morphology and phase composition of the films were analyzed by energy dispersive spectroscopy, scanning electron microscopy and X-ray diffraction, respectively. Mechanical properties were additionally measured by using a nanoindentation tester. A shorter pulse duration resulted in a lower rate of increase in the substrate temperature with an exponentially higher peak target current. The obtained films had a high Al content of 70–73 at.% with a mixed highly (0002) textured wurtzite phase and a secondary phase of cubic (220) grains. Even with the wurtzite phase and the relatively high Al contents of more than 70 at.%, the films exhibited a high hardness of more than 30 GPa with a relatively smooth surface of less than 2 nm root-mean-square roughness. The hardest and smoothest surfaces were obtained for pulses with an intermediate duration of 150 μs. The differences between the obtained film properties under different pulse durations are discussed on the basis of the grain growth process observed by transmission electron microscopy. The feasibility of the low-temperature synthesis of AlN rich wurtzite phase (Ti,Al)N films with superior hardness by HIPIMS plasma duration was demonstrated. - Highlights: • Low temperature synthesis of AlN rich wurtzite phase (Ti,Al)N film was demonstrated. • 1 μm-thick TiAlN film was deposited under the temperature less than 150 °C by HIPIMS. • High Al content with highly (0002) textured wurtzite phase structure was obtained. • High hardness of 35 GPa were

Development and characterization of edible films based on gluten from semi-hard and soft Brazilian wheat flours (development of films based on gluten from wheat flours Desenvolvimento e caracterização de filmes comestíveis de glúten de farinhas fortes e fracas de trigos brasileiros

Directory of Open Access Journals (Sweden)

Patrícia Sayuri Tanada-Palmu

2003-08-01

Full Text Available Edible films based on gluten from four types of Brazilian wheat gluten (2 "semi-hard" and 2 "soft" were prepared and mechanical and barrier properties were compared with those of wheat gluten films with vital gluten. Water vapor, oxygen permeability, tensile strength and percent elongation at break, solubility in water and surface morphology were measured. The films from "semi-hard" wheat flours showed similar water vapor permeability and solubility in water to films from vital gluten and better tensile strength than the films from "soft" and vital gluten. The films from vital gluten had higher elongation at break and oxygen permeability and also lower solubility in water than the films from the Brazilian wheat "soft" flours. In spite of the vital gluten showed greater mechanical resistance, desirable for the bakery products, for the purpose of developing gluten films Brazilian "semi-hard" wheat flours can be used instead of vital gluten, since they showed similar barrier and mechanical properties.Filmes à base de glúten de quatro tipos de farinhas de trigo brasileiras (2 "semi-fortes " e 2 "fracas" foram preparados e suas propriedades mecânicas e de barreira foram comparadas com filmes com glúten vital (comercial. Permeabilidade ao vapor d'água e oxigênio, resistência à tração, porcentagem de elongação na ruptura, solubilidade em água e morfologia de superfície foram medidas. Filmes de glúten das farinhas "semi-fortes" mostraram similar permeabilidade ao vapor d'água e solubilidade em água em comparação aos filmes de glúten vital e melhor resistência à tração do que os filmes das farinhas "fracas" e glúten vital. O filme de glúten vital apresentou maior elongação na ruptura e permeabilidade ao oxigênio do que os filmes das farinhas brasileiras e ainda mais baixa solubilidade que as farinhas fracas. Apesar do glúten vital ter uma grande resistência mecânica, desejável para produtos de panificação, para o prop

Evaluation of the adhesion strength of diamond films brazed on K-10 type hard metal

Directory of Open Access Journals (Sweden)

Santos Sérgio Ivan dos

2004-01-01

Full Text Available The coating of cutting tools with diamond films considerably increases the tool performance due to the combination of the unique tribological properties of diamond with the bulk properties of the substrate (toughness. The tool performance, however, is strongly related to the adhesion strength between the film and the substrate. In this work our main goal was to propose and to test a procedure, based on a tensile strength test, to evaluate the adhesion strength of a diamond wafer brazed on a hard metal substrate, taking into account the effect of the brazing temperature and time. The temperature range studied was from 800 to 980 °C and the brazing time ranged from 3 to 40 min. The obtained results could be used to optimize the costs and time required to the production of high performance cutting tools with brazed diamond wafers.

Extruded blend films of poly(vinyl alcohol) and polyolefins: common and hard-elastic nanostructure evolution in the polyolefin during straining as monitored by SAXS

International Nuclear Information System (INIS)

Stribeck, Norbert; Zeinolebadi, Ahmad; Fakirov, Stoyko; Bhattacharyya, Debes; Botta, Stephan

2013-01-01

Straining of PVA/PE and PVA/PP blends (70:30) is monitored by small-angle x-ray scattering (SAXS). Sheet-extruded films with different predraw ratio are investigated. The discrete SAXS of predrawn samples originates from polyolefin nanofibrils inside of polyolefin microfibrils immersed in a PVA matrix. PE nanofibrils deform less than the macroscopic strain without volume change. PP nanofibrils experience macroscopic strain. They lengthen but their diameter does not decrease. This is explained by strain-induced crystallization of PP from an amorphous depletion shell around the core of the nanofibril. The undrawn PVA/PE film exhibits isotropic semicrystalline nanostructure. Undrawn PVA/PP holds PP droplets containing oriented stacks of semicrystalline PP like neat precursors of hard-elastic thermoplasts. Respective predrawn films are softer than the undrawn material, indicating conversion into the hard-elastic state. Embedding of the polyolefin significantly retards neck formation. The polyolefin microfibrils can easily be extracted from the water-soluble matrix. (paper)

Nano-hardness estimation by means of Ar+ ion etching

International Nuclear Information System (INIS)

Bartali, R.; Micheli, V.; Gottardi, G.; Vaccari, A.; Safeen, M.K.; Laidani, N.

2015-01-01

When the coatings are in nano-scale, the mechanical properties cannot be easily estimated by means of the conventional methods due to: tip shape, instrument resolution, roughness, and substrate effect. In this paper, we proposed a semi-empirical method to evaluate the mechanical properties of thin films based on the sputtering rate induced by bombardment of Ar + ion. The Ar + ion bombardment was induced by ion gun implemented in Auger electron spectroscopy (AES). This procedure has been applied on a series of coatings with different structure (carbon films) and a series of coating with a different density (ZnO thin films). The coatings were deposited on Silicon substrates by RF sputtering plasma. The results show that, as predicted by Insepov et al., there is a correlation between hardness and sputtering rate. Using reference materials and a simple power law equation the estimation of the nano-hardness using an Ar + beam is possible. - Highlights: • ZnO film and Carbon films were grown on silicon using PVD. • The growth temperature was room temperature. • The hardness of the coatings was estimated by means of nanoindentation. • Evaluation of resistance of materials to the mechanical damage induced by an Ar + ion gun (AES). • The hardness have been studied and a power law with the erosion rate has been found

The rf-power dependences of the deposition rate, the hardness and the corrosion-resistance of the chromium nitride film deposited by using a dual ion beam sputtering system

International Nuclear Information System (INIS)

Lim, Jongmin; Lee, Chongmu

2006-01-01

The hexavalent chromium used in chromium plating is so toxic that it is very hazardous to human body and possibly causes cancer in humans. Therefore, it is indispensable to develop an alternative deposition technique. Dependences of the deposition rate, the phases, the hardness, the surface roughness and the corrosion-resistance of CrN x deposited on the high speed steel substrate by using a dual ion beam sputtering system on the rf-power were investigated to see the feasibility of sputtering as an alternative technique for chromium plating. The dual ion beam sputtering system used in this study was designed in such a way as the primary argon ion beam and the secondary nitrogen ion beam are injected toward the target and the substrate, respectively so that the chromium atoms at the chromium target surface may not nearly react with nitrogen atoms. The hardness and the surface roughness were measured by a micro-Vicker's hardness tester and an atomic force microscope (AFM), respectively. X-ray diffraction analyses were performed to identify phases in the films. The deposition rate of CrN x depends more strongly upon the rf-power for argon ion beam than that for nitrogen ion beam. The hardness of the CrN x film is highest when the volume percent of the Cr 2 N phase in the film is highest. Amorphous films are obtained when the rf-power for nitrogen ion beam is much higher than that for argon ion beam. The CrN x film deposited by using the sputtering technique under the optimal condition provides corrosion-resistance comparable to that of the electroplated chromium

Incomparable hardness and modulus of biomimetic porous polyurethane films prepared by directional melt crystallization of a solvent

Science.gov (United States)

An, Suyeong; Kim, Byoungsoo; Lee, Jonghwi

2017-07-01

Porous materials with surprisingly diverse structures have been utilized in nature for many functional purposes. However, the structures and applications of porous man-made polymer materials have been limited by the use of processing techniques involving foaming agents. Herein, we demonstrate for the first time the outstanding hardness and modulus properties of an elastomer that originate from the novel processing approach applied. Polyurethane films of 100-μm thickness with biomimetic ordered porous structures were prepared using directional melt crystallization of a solvent and exhibited hardness and modulus values that were 6.8 and 4.3 times higher than those of the random pore structure, respectively. These values surpass the theoretical prediction of the typical model for porous materials, which works reasonably well for random pores but not for directional pores. Both the ordered and random pore structures exhibited similar porosities and pore sizes, which decreased with increasing solution concentration. This unexpectedly significant improvement of the hardness and modulus could open up new application areas for porous polymeric materials using this relatively novel processing technique.

2TB hard disk drive

CERN Multimedia

This particular object was used up until 2012 in the Data Centre. It slots into one of the Disk Server trays. Hard disks were invented in the 1950s. They started as large disks up to 20 inches in diameter holding just a few megabytes (link is external). They were originally called "fixed disks" or "Winchesters" (a code name used for a popular IBM product). They later became known as "hard disks" to distinguish them from "floppy disks (link is external)." Hard disks have a hard platter that holds the magnetic medium, as opposed to the flexible plastic film found in tapes and floppies.

Family Porn - the zodiac-film

DEFF Research Database (Denmark)

Thorsen, Christian Isak

2015-01-01

This article addresses the highly popular Danish Zodiac films, a series of six films made between 1973 and 1978. What was extraordinary about the films was their combination of traditional popular comedy and hard-core porn. Analysing the films� combination of comedy and pornography from a histori......This article addresses the highly popular Danish Zodiac films, a series of six films made between 1973 and 1978. What was extraordinary about the films was their combination of traditional popular comedy and hard-core porn. Analysing the films� combination of comedy and pornography from...

Characteristics of SiOx-containing hard film prepared by low temperature plasma enhanced chemical vapor deposition using hexamethyldisilazane or vinyltrimethylsilane and post oxygen plasma treatment

Energy Technology Data Exchange (ETDEWEB)

Wei, Yi-Syuan; Liu, Wan-Yu; Wu, Hsin-Ming [Department of Materials Engineering, Tatung University, Taipei, 104, Taiwan (China); Chen, Ko-Shao, E-mail: kschen@ttu.edu.tw [Department of Materials Engineering, Tatung University, Taipei, 104, Taiwan (China); Cech, Vladimir [Institute of Materials Chemistry, Brno University of Technology (Czech Republic)

2017-03-01

This study, monomers of hexamethyldisilazane (HMDSZ) and vinyltrimethylsilane (VTMS) were respectively used to deposit on the surface of polyethylene terephthalate (PET) substrate by plasma enhanced chemical vapor deposition. Oxygen plasma treatment follows the HMDSZ and VTMS deposition to produce a hydrophilic surface film on the deposited surface. Time for HMDSZ and VTMS plasma deposition was changed to investigate its influences on water contact angle, deposited film thickness, refractive index, and friction coefficient properties. The surface morphologies of the processed samples were observed by scanning electron microscope and their chemical compositions were measured by X-ray photoelectron spectroscopy. At 550 nm wavelength, the optical transmittance of PET after the HMDSZ treatment decreases from 89% to 83%, but increases from 89% to 95% for the VTMS treatment. With increase in HMDSZ and VTMS deposition times, the film thickness increases and the refractive index decreases. Result revealed by XPS, SiO{sub 2} film is formed on the sample surface after the O{sub 2} plasma treatment. The film adhesion capability by the HMDSZ+O{sub 2} and VTMS+O{sub 2} treatment was stronger than that by the HMDSZ and VTMS treatment only. The SiOx films produced by HMDSZ+O{sub 2} and VTMS+O{sub 2} treatment can increase the film hardness and improve light transmittance. - Highlights: • With increase in HMDSZ and VTMS deposition times, the film thickness increases and the refractive index decreases. • The optical transmittance of PET after the VTMS treatment increases from 89% to 95%. • The SiO{sub 2} films deposited by HMDSZ+O{sub 2} and VTMS+O{sub 2} plasma can increase the film hardness and improve light transmittance. • It is expected that they can be applied to the optical transmittance protective film on plastic substrate in the future.

Effect of deposition temperature and thermal annealing on the dry etch rate of a-C: H films for the dry etch hard process of semiconductor devices

International Nuclear Information System (INIS)

Lee, Seung Moo; Won, Jaihyung; Yim, Soyoung; Park, Se Jun; Choi, Jongsik; Kim, Jeongtae; Lee, Hyeondeok; Byun, Dongjin

2012-01-01

The effect of deposition and thermal annealing temperatures on the dry etch rate of a-C:H films was investigated to increase our fundamental understanding of the relationship between thermal annealing and dry etch rate and to obtain a low dry etch rate hard mask. The hydrocarbon contents and hydrogen concentration were decreased with increasing deposition and annealing temperatures. The I(D)/I(G) intensity ratio and extinction coefficient of the a-C:H films were increased with increasing deposition and annealing temperatures because of the increase of sp 2 bonds in the a-C:H films. There was no relationship between the density of the unpaired electrons and the deposition temperature, or between the density of the unpaired electrons and the annealing temperature. However, the thermally annealed a-C:H films had fewer unpaired electrons compared with the as-deposited ones. Transmission electron microscopy analysis showed the absence of any crystallographic change after thermal annealing. The density of the as-deposited films was increased with increasing deposition temperature. The density of the 600 °C annealed a-C:H films deposited under 450 °C was decreased but at 550 °C was increased, and the density of all 800 °C annealed films was increased. The dry etch rate of the as-deposited a-C:H films was negatively correlated with the deposition temperature. The dry etch rate of the 600 °C annealed a-C:H films deposited at 350 °C and 450 °C was faster than that of the as-deposited film and that of the 800 °C annealed a-C:H films deposited at 350 °C and 450 °C was 17% faster than that of the as-deposited film. However, the dry etch rate of the 550 °C deposited a-C:H film was decreased after annealing at 600 °C and 800 °C. The dry etch rate of the as-deposited films was decreased with increasing density but that of the annealed a-C:H films was not. These results indicated that the dry etch rate of a-C:H films for dry etch hard masks can be further decreased by

Photon technology. Hard photon technology; Photon technology. Hard photon gijutsu

Energy Technology Data Exchange (ETDEWEB)

NONE

1996-03-01

Research results of hard photon technology have been summarized as a part of novel technology development highly utilizing the quantum nature of photon. Hard photon technology refers to photon beam technologies which use photon in the 0.1 to 200 nm wavelength region. Hard photon has not been used in industry due to the lack of suitable photon sources and optical devices. However, hard photon in this wavelength region is expected to bring about innovations in such areas as ultrafine processing and material synthesis due to its atom selective reaction, inner shell excitation reaction, and spatially high resolution. Then, technological themes and possibility have been surveyed. Although there are principle proposes and their verification of individual technologies for the technologies of hard photon generation, regulation and utilization, they are still far from the practical applications. For the photon source technology, the laser diode pumped driver laser technology, laser plasma photon source technology, synchrotron radiation photon source technology, and vacuum ultraviolet photon source technology are presented. For the optical device technology, the multi-layer film technology for beam mirrors and the non-spherical lens processing technology are introduced. Also are described the reduction lithography technology, hard photon excitation process, and methods of analysis and measurement. 430 refs., 165 figs., 23 tabs.

Nano-hardness estimation by means of Ar{sup +} ion etching

Energy Technology Data Exchange (ETDEWEB)

Bartali, R., E-mail: bartali@fbk.eu; Micheli, V.; Gottardi, G.; Vaccari, A.; Safeen, M.K.; Laidani, N.

2015-08-31

When the coatings are in nano-scale, the mechanical properties cannot be easily estimated by means of the conventional methods due to: tip shape, instrument resolution, roughness, and substrate effect. In this paper, we proposed a semi-empirical method to evaluate the mechanical properties of thin films based on the sputtering rate induced by bombardment of Ar{sup +} ion. The Ar{sup +} ion bombardment was induced by ion gun implemented in Auger electron spectroscopy (AES). This procedure has been applied on a series of coatings with different structure (carbon films) and a series of coating with a different density (ZnO thin films). The coatings were deposited on Silicon substrates by RF sputtering plasma. The results show that, as predicted by Insepov et al., there is a correlation between hardness and sputtering rate. Using reference materials and a simple power law equation the estimation of the nano-hardness using an Ar{sup +} beam is possible. - Highlights: • ZnO film and Carbon films were grown on silicon using PVD. • The growth temperature was room temperature. • The hardness of the coatings was estimated by means of nanoindentation. • Evaluation of resistance of materials to the mechanical damage induced by an Ar{sup +} ion gun (AES). • The hardness have been studied and a power law with the erosion rate has been found.

Determination of the surface band bending in InxGa1−xN films by hard x-ray photoemission spectroscopy

Directory of Open Access Journals (Sweden)

Mickael Lozac'h, Shigenori Ueda, Shitao Liu, Hideki Yoshikawa, Sang Liwen, Xinqiang Wang, Bo Shen, Kazuaki Sakoda, Keisuke Kobayashi and Masatomo Sumiya

2013-01-01

Full Text Available Core-level and valence band spectra of InxGa1−xN films were measured using hard x-ray photoemission spectroscopy (HX-PES. Fine structure, caused by the coupling of the localized Ga 3d and In 4d with N 2s states, was experimentally observed in the films. Because of the large detection depth of HX-PES (~20 nm, the spectra contain both surface and bulk information due to the surface band bending. The InxGa1−xN films (x = 0–0.21 exhibited upward surface band bending, and the valence band maximum was shifted to lower binding energy when the mole fraction of InN was increased. On the other hand, downward surface band bending was confirmed for an InN film with low carrier density despite its n-type conduction. Although the Fermi level (EF near the surface of the InN film was detected inside the conduction band as reported previously, it can be concluded that EF in the bulk of the film must be located in the band gap below the conduction band minimum.

The Role of Ambient Gas and Pressure on the Structuring of Hard Diamond-Like Carbon Films Synthesized by Pulsed Laser Deposition

Directory of Open Access Journals (Sweden)

Andrei C. Popescu

2015-06-01

Full Text Available Hard carbon thin films were synthesized on Si (100 and quartz substrates by the Pulsed Laser Deposition (PLD technique in vacuum or methane ambient to study their suitability for applications requiring high mechanical resistance. The deposited films’ surface morphology was investigated by scanning electron microscopy, crystalline status by X-ray diffraction, packing and density by X-ray reflectivity, chemical bonding by Raman and X-ray photoelectron spectroscopy, adherence by “pull-out” measurements and mechanical properties by nanoindentation tests. Films synthesized in vacuum were a-C DLC type, while films synthesized in methane were categorized as a-C:H. The majority of PLD films consisted of two layers: one low density layer towards the surface and a higher density layer in contact with the substrate. The deposition gas pressure played a crucial role on films thickness, component layers thickness ratio, structure and mechanical properties. The films were smooth, amorphous and composed of a mixture of sp3-sp2 carbon, with sp3 content ranging between 50% and 90%. The thickness and density of the two constituent layers of a film directly determined its mechanical properties.

Hard x-ray contact microscopy with 250 nm spatial resolution using a LiF film detector and a tabletop microsource

International Nuclear Information System (INIS)

Almaviva, S.; Bonfigli, F.; Franzini, I.; Lai, A.; Montereali, R. M.; Pelliccia, D.; Cedola, A.; Lagomarsino, S.

2006-01-01

An innovative route for deep-submicrometer spatial resolution hard x-ray microscopy with tabletop x-ray source is proposed. A film of lithium fluoride (LiF) was used as imaging detector in contact mode. We present here the x-ray images recorded on LiF films of a Fresnel zone plate with submicrometer gold structures and of an onion cataphyll. The images were read with an optical confocal microscope in fluorescence mode. The measured spatial resolution was about 250 nm, i.e., close to the resolution limit of the confocal microscope. The advantages and drawbacks, and the possible improvements, of this route are discussed

Hard copies for digital medical images: an overview

Science.gov (United States)

Blume, Hartwig R.; Muka, Edward

1995-04-01

This paper is a condensed version of an invited overview on the technology of film hard-copies used in radiology. Because the overview was given to an essentially nonmedical audience, the reliance on film hard-copies in radiology is outlined in greater detail. The overview is concerned with laser image recorders generating monochrome prints on silver-halide films. The basic components of laser image recorders are sketched. The paper concentrates on the physical parameters - characteristic function, dynamic range, digitization resolution, modulation transfer function, and noise power spectrum - which define image quality and information transfer capability of the printed image. A preliminary approach is presented to compare the printed image quality with noise in the acquired image as well as with the noise of state-of- the-art cathode-ray-tube display systems. High-performance laser-image- recorder/silver-halide-film/light-box systems are well capable of reproducing acquired radiologic information. Most recently development was begun toward a display function standard for soft-copy display systems to facilitate similarity of image presentation between different soft-copy displays as well as between soft- and hard-copy displays. The standard display function is based on perceptional linearization. The standard is briefly reviewed to encourage the printer industry to adopt it, too.

A new, bright and hard aluminum surface produced by anodization

Science.gov (United States)

Hou, Fengyan; Hu, Bo; Tay, See Leng; Wang, Yuxin; Xiong, Chao; Gao, Wei

2017-07-01

Anodized aluminum (Al) and Al alloys have a wide range of applications. However, certain anodized finishings have relatively low hardness, dull appearance and/or poor corrosion resistance, which limited their applications. In this research, Al was first electropolished in a phosphoric acid-based solution, then anodized in a sulfuric acid-based solution under controlled processing parameters. The anodized specimen was then sealed by two-step sealing method. A systematic study including microstructure, surface morphology, hardness and corrosion resistance of these anodized films has been conducted. Results show that the hardness of this new anodized film was increased by a factor of 10 compared with the pure Al metal. Salt spray corrosion testing also demonstrated the greatly improved corrosion resistance. Unlike the traditional hard anodized Al which presents a dull-colored surface, this newly developed anodized Al alloy possesses a very bright and shiny surface with good hardness and corrosion resistance.

Ultrahard carbon nanocomposite films

Energy Technology Data Exchange (ETDEWEB)

SIEGAL,MICHAEL P.; TALLANT,DAVID R.; PROVENCIO,PAULA P.; OVERMYER,DONALD L.; SIMPSON,REGINA L.; MARTINEZ-MIRANDA,L.J.

2000-01-27

Modest thermal annealing to 600 C of diamondlike amorphous-carbon (a-C) films grown at room temperature results in the formation of carbon nanocomposites with hardness similar to diamond. These nanocomposite films consist of nanometer-sized regions of high density a-C embedded in an a-C matrix with a reduced density of 5--10%. The authors report on the evolution of density and bonding topologies as a function of annealing temperature. Despite a decrease in density, film hardness actually increases {approximately} 15% due to the development of the nanocomposite structure.

Obtention of high hardness multilayer systems by laser ablation; Obtencion de sistemas multicapa de alta dureza por ablacion laser

Energy Technology Data Exchange (ETDEWEB)

Mejia T, I.S

2007-07-01

In this thesis work the synthesis of thin films of titanium nitride (TiN), amorphous carbon nitride (CN{sub x}) amorphous carbon (a-C) and Ti/TiN/CNx multilayers and Ti/TiN/a-C by means of the laser ablation technique, with the objective of obtaining films of high hardness is studied, as well as to produce multilayer coatings with superior properties to the individual layers. The effect that has the laser fluence used for ablationing the targets in the structure and mechanical properties of the films deposited of TiN was investigated. It was found that the hardness is increased in lineal way approximately with the fluence increment up to 19 J/cm{sup 2}. Thin films of a-C with hardness of the order of 12 GPa. likewise CN{sub x} films with high hardness (18.4 GPa) were obtained. The hardness of the deposited films was analyzed and it was related with its microstructure and deposit conditions. It was concluded that the Ti/TiN/CNx and Ti/TiN/a-C systems presented bigger hardness that of its individual components. (Author)

A novel epitaxially grown LSO-based thin-film scintillator for micro-imaging using hard synchrotron radiation

Energy Technology Data Exchange (ETDEWEB)

Douissard, P.A.; Martin, T.; Chevalier, V.; Rack, A. [European Synchrotron Radiat Facil, F-38043 Grenoble, (France); Cecilia, A.; Baumbach, T.; Rack, A. [Karlsruhe Inst Technol ANKA, D-76021 Karlsruhe, (Germany); Couchaud, M. [CEA LETI, F-38054 Grenoble, (France); Dupre, K. [FEE GmbH, D-55743 Idar Oberstein, (Germany); Kuhbacher, M. [Helmholtz Zentrum Berlin Mat and Energie, D-14109 Berlin, (Germany)

2010-07-01

The efficiency of high-resolution pixel detectors for hard X-rays is nowadays one of the major criteria which drives the feasibility of imaging experiments and in general the performance of an experimental station for synchrotron-based microtomography and radiography. Here the luminescent screen used for the indirect detection is focused on in order to increase the detective quantum efficiency a novel scintillator based on doped Lu{sub 2}SiO{sub 5} (LSO), epitaxially grown as thin film via the liquid phase epitaxy technique. It is shown that, by using adapted growth and doping parameters as well as a dedicated substrate, the scintillation behaviour of a LSO-based thin crystal together with the high stopping power of the material allows for high-performance indirect X-ray detection. In detail, the conversion efficiency, the radioluminescence spectra, the optical absorption spectra under UV/visible-light and the afterglow are investigated. A set-up to study the effect of the thin-film scintillator's temperature on its conversion efficiency is described as well it delivers knowledge which is important when working with higher photon flux densities and the corresponding high heat load on the material. Additionally, X-ray imaging systems based on different diffraction-limited visible-light optics and CCD cameras using among others LSO-based thin film are compared. Finally, the performance of the LSO thin film is illustrated by imaging a honey bee leg, demonstrating the value of efficient high-resolution computed tomography for life sciences. (authors)

Ultrahard carbon nanocomposite films

Energy Technology Data Exchange (ETDEWEB)

Siegal, M. P. [Sandia National Laboratories, Albuquerque, New Mexico 87185-1421 (United States); Tallant, D. R. [Sandia National Laboratories, Albuquerque, New Mexico 87185-1421 (United States); Provencio, P. N. [Sandia National Laboratories, Albuquerque, New Mexico 87185-1421 (United States); Overmyer, D. L. [Sandia National Laboratories, Albuquerque, New Mexico 87185-1421 (United States); Simpson, R. L. [Sandia National Laboratories, Albuquerque, New Mexico 87185-1421 (United States); Martinez-Miranda, L. J. [Department of Materials and Nuclear Engineering, University of Maryland, College Park, Maryland 20742 (United States)

2000-05-22

Modest thermal annealing to 600 degree sign C of diamondlike amorphous-carbon (a-C) films grown at room temperature results in the formation of carbon nanocomposites with hardness similar to diamond. These nanocomposite films consist of nanometer-sized regions of high density a-C embedded in an a-C matrix with a reduced density of 5%-10%. We report on the evolution of density and bonding topologies as a function of annealing temperature. Despite a decrease in density, film hardness actually increases {approx}15% due to the development of the nanocomposite structure. (c) 2000 American Institute of Physics.

The preparation and mechanical properties of Al-containing a-C : H thin films

International Nuclear Information System (INIS)

Zhang Guangan; Yan Pengxun; Wang Peng; Chen Youming; Zhang Junyan

2007-01-01

Al-containing hydrogenated amorphous carbon (Al-C : H) films were deposited on silicon substrates using a mid frequency magnetron sputtering Al target in an argon and methane gas mixture. The composition, surface morphology, hardness and friction coefficient of the films were characterized using x-ray photoelectron spectroscopy, atomic force microscopy, nanoindentation and tribological tester. The Al-C : H films deposited at low CH 4 content show high surface roughness, low hardness and high friction coefficient, similar to metallic Al films; in contrast, the Al-C : H films prepared under high CH 4 content indicate low surface roughness, high hardness and low friction coefficient, close to that of hard a-C : H films as wear-resistance films

Zirconium nitride hard coatings

International Nuclear Information System (INIS)

Roman, Daiane; Amorim, Cintia Lugnani Gomes de; Soares, Gabriel Vieira; Figueroa, Carlos Alejandro; Baumvol, Israel Jacob Rabin; Basso, Rodrigo Leonardo de Oliveira

2010-01-01

Zirconium nitride (ZrN) nanometric films were deposited onto different substrates, in order to study the surface crystalline microstructure and also to investigate the electrochemical behavior to obtain a better composition that minimizes corrosion reactions. The coatings were produced by physical vapor deposition (PVD). The influence of the nitrogen partial pressure, deposition time and temperature over the surface properties was studied. Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM) and corrosion experiments were performed to characterize the ZrN hard coatings. The ZrN films properties and microstructure changes according to the deposition parameters. The corrosion resistance increases with temperature used in the films deposition. Corrosion tests show that ZrN coating deposited by PVD onto titanium substrate can improve the corrosion resistance. (author)

Chain and mirophase-separated structures of ultrathin polyurethane films

International Nuclear Information System (INIS)

Kojio, Ken; Yamamoto, Yasunori; Motokucho, Suguru; Furukawa, Mutsuhisa; Uchiba, Yusuke

2009-01-01

Measurements are presented how chain and microphase-separated structures of ultrathin polyurethane (PU) films are controlled by the thickness. The film thickness is varied by a solution concentration for spin coating. The systems are PUs prepared from commercial raw materials. Fourier-transform infrared spectroscopic measurement revealed that the degree of hydrogen bonding among hard segment chains decreased and increased with decreasing film thickness for strong and weak microphase separation systems, respectively. The microphase-separated structure, which is formed from hard segment domains and a surrounding soft segment matrix, were observed by atomic force microscopy. The size of hard segment domains decreased with decreasing film thickness, and possibility of specific orientation of the hard segment chains was exhibited for both systems. These results are due to decreasing space for the formation of the microphase-separated structure.

Nano mechanical properties of carbon films modified by ion radiation

International Nuclear Information System (INIS)

Foerster, C.E.; Serbena, F.C.; Lepienski, C.M.; Odo, G.Y.; Zawislak, F.C.; Lopes, J.M.J.; Baptista, D.L.; Garcia, I.T.S.

2000-01-01

In present work it is measured hardness, Young modulus and friction coefficient values for different types of carbon films. These films were submitted to different ion bombardment conditions (energy and fluencies). The mechanical behavior was obtained by nano indentation technique and analyzed by the Oliver/Pharr method. For friction coefficient determination the nano scratch procedure is used. Pristine C 60 films (fullerenes) has a hardness of 0.33 GPa. After irradiation with different ions (He, N and Bi), the hardness raise to about 14 GPa and the Young modulus change from 20 to about 200 GPa. For photoresist film AZ-1350J irradiation with Ar and He change the hardness from 0.4 to about 14 GPa and the Young modulus raise from 4 to 80 GPa. In a-C-H the hardness change from 3.5 to 11 GPa when submitted to N irradiation. In PPA films the hardness value raise from 0.5 to 11 GPa after irradiation with Ar. These mechanical and tribological results were analyzed in terms of deposited energy by the ion irradiation and compared with those presented in the literature. (author)

Standard hardness conversion tables for metals relationship among brinell hardness, vickers hardness, rockwell hardness, superficial hardness, knoop hardness, and scleroscope hardness

CERN Document Server

American Society for Testing and Materials. Philadelphia

2007-01-01

1.1 Conversion Table 1 presents data in the Rockwell C hardness range on the relationship among Brinell hardness, Vickers hardness, Rockwell hardness, Rockwell superficial hardness, Knoop hardness, and Scleroscope hardness of non-austenitic steels including carbon, alloy, and tool steels in the as-forged, annealed, normalized, and quenched and tempered conditions provided that they are homogeneous. 1.2 Conversion Table 2 presents data in the Rockwell B hardness range on the relationship among Brinell hardness, Vickers hardness, Rockwell hardness, Rockwell superficial hardness, Knoop hardness, and Scleroscope hardness of non-austenitic steels including carbon, alloy, and tool steels in the as-forged, annealed, normalized, and quenched and tempered conditions provided that they are homogeneous. 1.3 Conversion Table 3 presents data on the relationship among Brinell hardness, Vickers hardness, Rockwell hardness, Rockwell superficial hardness, and Knoop hardness of nickel and high-nickel alloys (nickel content o...

Tailoring the surface chemical bond states of the NbN films by doping Ag: Achieving hard hydrophobic surface

Energy Technology Data Exchange (ETDEWEB)

Ren, Ping; Zhang, Kan; Du, Suxuan [Department of Materials Science, State Key Laboratory of Superhard Materials, and Key Laboratory of Automobile Materials, MOE, Jilin University, Changchun, 130012 (China); Meng, Qingnan [College of Construction Engineering, Jilin University, Changchun, 130026 (China); He, Xin [Department of Materials Science, State Key Laboratory of Superhard Materials, and Key Laboratory of Automobile Materials, MOE, Jilin University, Changchun, 130012 (China); Wang, Shuo [Department of Materials Science and Engineering, College of Engineering, Peking University, Beijing 100871 (China); Wen, Mao, E-mail: wenmao225@jlu.edu.cn [Department of Materials Science, State Key Laboratory of Superhard Materials, and Key Laboratory of Automobile Materials, MOE, Jilin University, Changchun, 130012 (China); Zheng, Weitao, E-mail: WTZheng@jlu.edu.cn [Department of Materials Science, State Key Laboratory of Superhard Materials, and Key Laboratory of Automobile Materials, MOE, Jilin University, Changchun, 130012 (China)

2017-06-15

Highlights: • Intrinsically hydrophilic NbN films can transfer to hydrophobic Nb-Ag-N films by doping Ag atoms into NbN sublattice. • Solute Ag can promote that the hydrophobic Ag{sub 2}O groups formed on the Nb-Ag-N film surface through self-oxidation. • The present work may provide a straightforward approach for the production of robust hydrophobic ceramic surfaces. - Abstract: Robust hydrophobic surfaces based on ceramics capable of withstanding harsh conditions such as abrasion, erosion and high temperature, are required in a broad range of applications. The metal cations with coordinative saturation or low electronegativity are commonly chosen to achieve the intrinsically hydrophobic ceramic by reducing Lewis acidity, and thus the ceramic systems are limited. In this work, we present a different picture that robust hydrophobic surface with high hardness (≥20 GPa) can be fabricated through doping Ag atoms into intrinsically hydrophilic ceramic film NbN by reactive co-sputtering. The transition of wettability from hydrophilic to hydrophobic of Nb-Ag-N films induced by Ag doping results from the appearance of Ag{sub 2}O groups on the films surfaces through self-oxidation, because Ag cations (Ag{sup +}) in Ag{sub 2}O are the filled-shell (4d{sup 10}5S{sup 0}) electronic structure with coordinative saturation that have no tendency to interact with water. The results show that surface Ag{sub 2}O benefited for hydrophobicity comes from the solute Ag atoms rather than precipitate metal Ag, in which the more Ag atoms incorporated into Nb-sublattice are able to further improve the hydrophobicity, whereas the precipitation of Ag nanoclusters would worsen it. The present work opens a window for fabricating robust hydrophobic surface through tailoring surface chemical bond states by doping Ag into transition metal nitrides.

Perhydropolysilazane-derived silica-polymethylmethacrylate hybrid thin films highly doped with spiropyran: Effects of polymethylmethacrylate on the hardness, chemical durability and photochromic properties

International Nuclear Information System (INIS)

Yamano, Akihiro; Kozuka, Hiromitsu

2011-01-01

Polymethylmethacrylate (PMMA)-perhydropolysilazane (PHPS) hybrid thin films doped with spiropyran were prepared by spin-coating, which were then converted into 0.26-1.7 μm thick, spiropyran-doped PMMA-silica hybrid films by exposure treatment over aqueous ammonia. The spiropyran/(spiropyran + PHPS + PMMA) mass ratio was fixed at a high value of 0.2 so that the films exhibit visual photochromic changes in color, while the PMMA/(PMMA + PHPS) mass ratio, r, was varied. The spiropyran molecules in the as-prepared films were in merocyanine (MC) and spiro (SP) forms, with and without an optical absorption at 500 nm, at low (r ≤ 0.2) and high (r ≥ 0.4) PMMA contents, respectively. When PMMA content r was increased from 0 to 0.2, the degree of the MC-to-SP conversion on vis light illumination was enhanced, while at higher r's the spiropyran molecules underwent photodegradation. When the silica film (r = 0) was soaked in xylene under vis light, the spiropyran molecules were almost totally leached out, while not on soaking in the dark. On the other hand, no leaching occurred for the film of r = 0.2 either in the presence or absence of vis light. These suggest that the introduction of PMMA is effective in improving the chemical durability of the films, while the silica film (r = 0) is an interesting material with a photoresponsive controlled-release ability. The pencil hardness of the films decreased with increasing PMMA content, but remained over 9H at r ≤ 0.4.

Boron Doped diamond films as electron donors in photovoltaics: An X-ray absorption and hard X-ray photoemission study

Energy Technology Data Exchange (ETDEWEB)

Kapilashrami, M.; Zegkinoglou, I. [Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Department of Physics, University of Wisconsin Madison, Madison, Wisconsin 53706 (United States); Conti, G.; Nemšák, S.; Conlon, C. S.; Fadley, C. S. [Department of Physics, University of California, Davis, California 95616 (United States); Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Törndahl, T.; Fjällström, V. [Ångström Solar Center, Uppsala University, Box 534, SE-751 21 Uppsala (Sweden); Lischner, J. [Department of Physics, University of California, Berkeley, California 94720 (United States); Louie, Steven G. [Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Department of Physics, University of California, Berkeley, California 94720 (United States); Hamers, R. J.; Zhang, L. [Department of Chemistry, University of Wisconsin Madison, Madison, Wisconsin 53706 (United States); Guo, J.-H. [Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States); Himpsel, F. J., E-mail: fhimpsel@wisc.edu [Department of Physics, University of Wisconsin Madison, Madison, Wisconsin 53706 (United States)

2014-10-14

Highly boron-doped diamond films are investigated for their potential as transparent electron donors in solar cells. Specifically, the valence band offset between a diamond film (as electron donor) and Cu(In,Ga)Se₂ (CIGS) as light absorber is determined by a combination of soft X-ray absorption spectroscopy and hard X-ray photoelectron spectroscopy, which is more depth-penetrating than standard soft X-ray photoelectron spectroscopy. In addition, a theoretical analysis of the valence band is performed, based on GW quasiparticle band calculations. The valence band offset is found to be small: VBO=VBM{sub CIGS} – VBM{sub diamond}=0.3 eV±0.1 eV at the CIGS/Diamond interface and 0.0 eV±0.1 eV from CIGS to bulk diamond. These results provide a promising starting point for optimizing the band offset by choosing absorber materials with a slightly lower valence band maximum.

Impact of X-ray irradiation on PMMA thin films

International Nuclear Information System (INIS)

Iqbal, Saman; Rafique, Muhammad Shahid; Anjum, Safia; Hayat, Asma; Iqbal, Nida

2012-01-01

Highlights: ► PMMA thin films were deposited at 300 °C and 500 °C using PLD technique. ► These films were irradiated with different fluence of laser produced X-rays. ► Irradiation affects the ordered packing as well as surface morphology of film. ► Hardness of film decreases up to certain value of X-ray fluence. ► Absorption in UV–visible range exhibits a non linear behavior. - Abstract: The objective of this project is to explore the effect of X-ray irradiation of thin polymeric films deposited at various substrate temperatures. pulsed laser deposition (PLD) technique is used for the deposition of PMMA thin films on glass substrate at 300 °C and 500 °C. These films have been irradiated with various X-rays fluences ranging from 2.56 to 5.76 mJ cm −2 . Characterization of the films (before and after the irradiation) is done with help of X-ray Diffractrometer, Optical Microscope, Vickers hardness tester and UV–vis spectroscopy techniques. From XRD data, it is revealed that ordered packing has been improved for the films deposited at 300 °C. However after irradiation the films exhibited the amorphous behavior regardless of the X-ray fluence. Film deposited at 500 °C shows amorphous structure before and after irradiation. Hardness and particle size of thin film have also increased with the increasing substrate temperature. However, the irradiation has reverse effect i.e. the particle size as well as the hardness has reduced. Irradiation has also enhanced the absorption in the UV–visible region.

Nanostructured thin films and coatings mechanical properties

CERN Document Server

2010-01-01

The first volume in "The Handbook of Nanostructured Thin Films and Coatings" set, this book concentrates on the mechanical properties, such as hardness, toughness, and adhesion, of thin films and coatings. It discusses processing, properties, and performance and provides a detailed analysis of theories and size effects. The book presents the fundamentals of hard and superhard nanocomposites and heterostructures, assesses fracture toughness and interfacial adhesion strength of thin films and hard nanocomposite coatings, and covers the processing and mechanical properties of hybrid sol-gel-derived nanocomposite coatings. It also uses nanomechanics to optimize coatings for cutting tools and explores various other coatings, such as diamond, metal-containing amorphous carbon nanostructured, and transition metal nitride-based nanolayered multilayer coatings.

Pd thin films on flexible substrate for hydrogen sensor

Energy Technology Data Exchange (ETDEWEB)

Öztürk, Sadullah [Fatih Sultan Mehmet Vakıf University, Engineering Faculty, Istanbul (Turkey); Kılınç, Necmettin, E-mail: nkilinc@nigde.edu.tr [Nigde University, Mechatronics Engineering Department, 51245 Nigde (Turkey); Nigde University, Nanotechnology Application and Research Center, 51245 Nigde (Turkey)

2016-07-25

In this work, palladium (Pd) thin films were prepared via RF sputtering method with various thicknesses (6 nm, 20 nm and 60 nm) on both a flexible substrate and a hard substrate. Hydrogen (H{sub 2}) sensing properties of Pd films on flexible substrate have been investigated depending on temperatures (25–100 °C) and H{sub 2} concentrations (600 ppm – 10%). The effect of H{sub 2} on structural properties of the films was also studied. The films were characterized by Scanning Electron Microscopy (SEM) and X-ray diffraction. It is found that whole Pd films on hard substrate show permanent structural deformation after exposed to 10% H{sub 2} for 30 min. But, this H{sub 2} exposure does not causes any structural deformation for 6 nm Pd film on flexible substrate and 6 nm Pd film on flexible substrate shows reversible sensor response up to 10% H{sub 2} concentration without any structural deformation. On the other hand, Pd film sensors that have the thicknesses 20 nm and 60 nm on flexible substrate are irreversible for higher H{sub 2} concentration (>2%) with film deformation. The sensor response of 6 nm Pd film on flexible substrate increased with increasing H{sub 2} concentration up 4% and then saturated. The sensitivity of the film decreased with increasing operation temperature. - Highlights: • Pd thin films fabricated by RF sputtering on both flexible and hard substrates. • Structural deformation observed for films on hard substrate after exposing 10% H{sub 2}. • 6 nm Pd film on flexible substrate shows reversible sensor response up to 10% H{sub 2}. • H{sub 2} sensing properties of film on flexible substrate investigated depending on temperature and concentration. • The sensitivity of the film decreased with increasing operation temperature.

Impact of X-ray irradiation on PMMA thin films

Energy Technology Data Exchange (ETDEWEB)

Iqbal, Saman, E-mail: saman.khan343@gmail.com [Physics Department, University of Engineering and Technology, Lahore (Pakistan); Rafique, Muhammad Shahid [Physics Department, University of Engineering and Technology, Lahore (Pakistan); Anjum, Safia [Physics Department, Lahore College for Woman University, Lahore (Pakistan); Hayat, Asma [Physics Department, University of Engineering and Technology, Lahore (Pakistan); Iqbal, Nida [Faculty of Biomedical Engineering and Health Science, Universiti Teknologi Malaysia (UTM) (Malaysia)

2012-10-15

Highlights: Black-Right-Pointing-Pointer PMMA thin films were deposited at 300 Degree-Sign C and 500 Degree-Sign C using PLD technique. Black-Right-Pointing-Pointer These films were irradiated with different fluence of laser produced X-rays. Black-Right-Pointing-Pointer Irradiation affects the ordered packing as well as surface morphology of film. Black-Right-Pointing-Pointer Hardness of film decreases up to certain value of X-ray fluence. Black-Right-Pointing-Pointer Absorption in UV-visible range exhibits a non linear behavior. - Abstract: The objective of this project is to explore the effect of X-ray irradiation of thin polymeric films deposited at various substrate temperatures. pulsed laser deposition (PLD) technique is used for the deposition of PMMA thin films on glass substrate at 300 Degree-Sign C and 500 Degree-Sign C. These films have been irradiated with various X-rays fluences ranging from 2.56 to 5.76 mJ cm{sup -2}. Characterization of the films (before and after the irradiation) is done with help of X-ray Diffractrometer, Optical Microscope, Vickers hardness tester and UV-vis spectroscopy techniques. From XRD data, it is revealed that ordered packing has been improved for the films deposited at 300 Degree-Sign C. However after irradiation the films exhibited the amorphous behavior regardless of the X-ray fluence. Film deposited at 500 Degree-Sign C shows amorphous structure before and after irradiation. Hardness and particle size of thin film have also increased with the increasing substrate temperature. However, the irradiation has reverse effect i.e. the particle size as well as the hardness has reduced. Irradiation has also enhanced the absorption in the UV-visible region.

Boron Doped diamond films as electron donors in photovoltaics: An X-ray absorption and hard X-ray photoemission study

International Nuclear Information System (INIS)

Kapilashrami, M.; Zegkinoglou, I.; Conti, G.; Nemšák, S.; Conlon, C. S.; Fadley, C. S.; Törndahl, T.; Fjällström, V.; Lischner, J.; Louie, Steven G.; Hamers, R. J.; Zhang, L.; Guo, J.-H.; Himpsel, F. J.

2014-01-01

Highly boron-doped diamond films are investigated for their potential as transparent electron donors in solar cells. Specifically, the valence band offset between a diamond film (as electron donor) and Cu(In,Ga)Se 2 (CIGS) as light absorber is determined by a combination of soft X-ray absorption spectroscopy and hard X-ray photoelectron spectroscopy, which is more depth-penetrating than standard soft X-ray photoelectron spectroscopy. In addition, a theoretical analysis of the valence band is performed, based on GW quasiparticle band calculations. The valence band offset is found to be small: VBO = VBM CIGS – VBM diamond  = 0.3 eV ± 0.1 eV at the CIGS/Diamond interface and 0.0 eV ± 0.1 eV from CIGS to bulk diamond. These results provide a promising starting point for optimizing the band offset by choosing absorber materials with a slightly lower valence band maximum.

TRIBOLOGY OF BIO-INSPIRED NANOWRINKLED FILMS ON ULTRASOFT SUBSTRATES

Directory of Open Access Journals (Sweden)

Juergen M. Lackner

2013-03-01

Full Text Available Biomimetic design of new materials uses nature as antetype, learning from billions of years of evolution. This work emphasizes the mechanical and tribological properties of skin, combining both hardness and wear resistance of its surface (the stratum corneum with high elasticity of the bulk (epidermis, dermis, hypodermis. The key for combination of such opposite properties is wrinkling, being consequence of intrinsic stresses in the bulk (soft tissue: Tribological contact to counterparts below the stress threshold for tissue trauma occurs on the thick hard stratum corneum layer pads, while tensile loads smooth out wrinkles in between these pads. Similar mechanism offers high tribological resistance to hard films on soft, flexible polymers, which is shown for diamond-like carbon (DLC and titanium nitride thin films on ultrasoft polyurethane and harder polycarbonate substrates. The choice of these two compared substrate materials will show that ultra-soft substrate materials are decisive for the distinct tribological material. Hierarchical wrinkled structures of films on these substrates are due to high intrinsic compressive stress, which evolves during high energetic film growth. Incremental relaxation of these stresses occurs by compound deformation of film and elastic substrate surface, appearing in hierarchical nano-wrinkles. Nano-wrinkled topographies enable high elastic deformability of thin hard films, while overstressing results in zigzag film fracture along larger hierarchical wrinkle structures. Tribologically, these fracture mechanisms are highly important for ploughing and sliding of sharp and flat counterparts on hard-coated ultra-soft substrates like polyurethane. Concentration of polyurethane deformation under the applied normal loads occurs below these zigzag cracks. Unloading closes these cracks again. Even cyclic testing do not lead to film delamination and retain low friction behavior, if the adhesion to the substrate is high

Tribology of bio-inspired nanowrinkled films on ultrasoft substrates.

Science.gov (United States)

Lackner, Juergen M; Waldhauser, Wolfgang; Major, Lukasz; Teichert, Christian; Hartmann, Paul

2013-01-01

Biomimetic design of new materials uses nature as antetype, learning from billions of years of evolution. This work emphasizes the mechanical and tribological properties of skin, combining both hardness and wear resistance of its surface (the stratum corneum) with high elasticity of the bulk (epidermis, dermis, hypodermis). The key for combination of such opposite properties is wrinkling, being consequence of intrinsic stresses in the bulk (soft tissue): Tribological contact to counterparts below the stress threshold for tissue trauma occurs on the thick hard stratum corneum layer pads, while tensile loads smooth out wrinkles in between these pads. Similar mechanism offers high tribological resistance to hard films on soft, flexible polymers, which is shown for diamond-like carbon (DLC) and titanium nitride thin films on ultrasoft polyurethane and harder polycarbonate substrates. The choice of these two compared substrate materials will show that ultra-soft substrate materials are decisive for the distinct tribological material. Hierarchical wrinkled structures of films on these substrates are due to high intrinsic compressive stress, which evolves during high energetic film growth. Incremental relaxation of these stresses occurs by compound deformation of film and elastic substrate surface, appearing in hierarchical nano-wrinkles. Nano-wrinkled topographies enable high elastic deformability of thin hard films, while overstressing results in zigzag film fracture along larger hierarchical wrinkle structures. Tribologically, these fracture mechanisms are highly important for ploughing and sliding of sharp and flat counterparts on hard-coated ultra-soft substrates like polyurethane. Concentration of polyurethane deformation under the applied normal loads occurs below these zigzag cracks. Unloading closes these cracks again. Even cyclic testing do not lead to film delamination and retain low friction behavior, if the adhesion to the substrate is high and the initial

Nanolaminated TiN/Mo2N hard multilayer coatings

International Nuclear Information System (INIS)

Martev, I N; Dechev, D A; Ivanov, N P; Uzunov, T S D; Kashchieva, E P

2010-01-01

The paper presents results on the synthesis of hard multilayer coatings consisting of titanium nitride and molybdenum nitride thin films with thickness of several nm. The TiN and Mo 2 N films were successively deposited by reactive DC magnetron sputtering. These multilayer structures were investigated by Auger electron spectroscopy (AES), transmission electron microscopy (TEM), selected area electron diffraction (SAED), X-ray diffraction (XRD), cross-section scanning electron microscopy (CSSEM) and cross-section electron probe microanalysis (CSEPMA). The mechanical properties of the multilayer coatings, namely, hardness, Young's modulus and the coefficient of plastic deformation were measured. The adhesion was evaluated by the Rockwell-C-impact test. Coatings with different total thickness were examined with respect to adhesion to substrates of tool materials.

Steve Rogers' Character in Captain America: the First Avenger as a Representation of Hard Working Value in Traditional American Values

OpenAIRE

RAMADHAN, BHAYU

2013-01-01

Film is one of the most popular media which often elevates social values of a society. One of American social values is shown in Captain America: The First Avenger. Captain America: The First Avenger clearly portrays Steve Rogers' character as the representation of the hard working value of the Traditional American Values. In this film, Steve Rogers represents the hard working value by depicting the six characteristics of hard worker. The first characteristic of hard worker that is depicted b...

Interaction domains in high performance NdFeB thick films

Energy Technology Data Exchange (ETDEWEB)

Woodcock, Tom; Khlopkov, Kirill; Schultz, Ludwig; Gutfleisch, Oliver [IFW Dresden, IMW, Dresden (Germany); Walther, Arno [Insitut Neel, CNRS-UJF, Grenoble (France); CEA Leti - MINATEC, Grenoble (France); Dempsey, Nora; Givord, Dominique [Insitut Neel, CNRS-UJF, Grenoble (France)

2009-07-01

Thick sputtered films (5-300 micron) of NdFeB have excellent hard magnetic properties which make them attractive for applications in micro-electro-mechanical systems (MEMS). A two step process consisting of triode sputtering and high temperature annealing produced films with energy densities approaching those of sintered NdFeB magnets. Magnetic force microscopy (MFM) using hard magnetic tips showed that the films deposited without substrate heating and at 300 C exhibited magnetic domains typical of low anisotropy materials. These films were amorphous in the as-deposited state. The film deposited at 500 C was crystalline and displaid hard magnetic properties. This was reflected in the magnetic microstructure which showed interaction domains typical of highly textured and high magnetic anisotropy materials with a grain size below or equal to the critical single-domain particle limit. With increasing substrate temperature, the domain patterns of the annealed films became coarser, indicating higher degrees of texture.

Mechanical properties of ultra-thin HfO2 films studied by nano scratches tests

International Nuclear Information System (INIS)

Fu, Wei-En; Chang, Yong-Qing; Chang, Chia-Wei; Yao, Chih-Kai; Liao, Jiunn-Der

2013-01-01

10-nm-thick atomic layer deposited HfO 2 films were characterized in terms of wear resistance and indentation hardness to investigate the thermal annealing induced impacts on mechanical properties. The wear resistance of ultra-thin films at low loads was characterized using nano-scratch tests with an atomic force microscope. The depth of the nano-scratches decreases with increasing annealing temperature, indicating that the hardness of the annealed films increases with the annealing temperatures. Surface nanoindentation was also performed to confirm the nanoscratch test results. The hardness variation of the annealed films is due to the generation of HfSi x O y induced by the thermal annealing. X-ray photoelectron spectroscopy measurements proved that the hardness of formed HfSi x O y with increasing annealing temperatures. The existence of HfSi x O y broadens the interface, and causes the increase of the interfacial layer thickness. As a result, the surface hardness increases with the increasing HfSi x O y induced by the thermal annealing. - Highlights: ► Mechanical properties of HfO 2 films were assessed by nano-scratch and indentation. ► Scratch depth of HfO 2 films decreased with the increase of annealing temperatures. ► Nano-hardness of HfO 2 films increased with the increase of annealing temperatures

Iron, nitrogen and silicon doped diamond like carbon (DLC) thin films: A comparative study

International Nuclear Information System (INIS)

Ray, Sekhar C.; Pong, W.F.; Papakonstantinou, P.

2016-01-01

The X-ray absorption near edge structure (XANES), X-ray photoelectron spectroscopy (XPS), valence band photoemission (VB-PES) and Raman spectroscopy results show that the incorporation of nitrogen in pulsed laser deposited diamond like carbon (DLC) thin films, reverts the sp"3 network to sp"2 as evidenced by an increase of the sp"2 cluster and I_D/I_G ratio in C K-edge XANES and Raman spectra respectively which reduces the hardness/Young's modulus into the film network. Si-doped DLC film deposited in a plasma enhanced chemical vapour deposition process reduces the sp"2 cluster and I_D/I_G ratio that causes the decrease of hardness/Young's modulus of the film structure. The Fe-doped DLC films deposited by dip coating technique increase the hardness/Young's modulus with an increase of sp"3-content in DLC film structure. - Highlights: • Fe, N and Si doped DLC films deposited by dip, PLD and PECVD methods respectively • DLC:Fe thin films have higher hardness/Young's modulus than DLC:N(:Si) thin films. • sp"3 and sp"2 contents are estimated from C K-edge XANES and VB-PES measurements.

Mechanical characterization of solution-derived nanoparticle silver ink thin films

International Nuclear Information System (INIS)

Greer, Julia R.; Street, Robert A.

2007-01-01

Mechanical properties of sintered silver nanoparticles are investigated via substrate curvature and nanoindentation methods. Substrate curvature measurements reveal that permanent microstructural changes occur during initial heating while subsequent annealing results in nearly elastic behavior of the thinner films. Thicker films were found to crack upon thermal treatment. The coefficient of thermal expansion was determined from linear slopes of curvature curves to be 1.9±0.097 ppm/ degree sign C, with elastic modulus and hardness determined via nanoindentation. Accounting for substrate effects, nanoindentation hardness and modulus remained constant for different film thicknesses and did not appear to be a function of annealing conditions. Hardness of 0.91 GPa and modulus of 110 GPa are somewhat lower than expected for a continuous nanocrystalline silver film, most likely due to porosity

Nanostructured diamond film deposition on curved surfaces of metallic temporomandibular joint implant

Energy Technology Data Exchange (ETDEWEB)

Fries, Marc D; Vohra, Yogesh K [Department of Physics, University of Alabama at Birmingham (UAB), Birmingham, AL (United States)

2002-10-21

Microwave plasma chemical vapour deposition of nanostructured diamond films was carried out on curved surfaces of Ti-6Al-4V alloy machined to simulate the shape of a temporomandibular joint (TMJ) dental implant. Raman spectroscopy shows that the deposited films are uniform in chemical composition along the radius of curvature of the TMJ condyle. Thin film x-ray diffraction reveals an interfacial carbide layer and nanocrystalline diamond grains in this coating. Nanoindentation hardness measurements show an ultra-hard coating with a hardness value of 60{+-}5 GPa averaged over three samples. (rapid communication)

Hardness and electrochemical behavior of ceramic coatings on Inconel

Directory of Open Access Journals (Sweden)

C. SUJAYA

2012-03-01

Full Text Available Thin films of ceramic materials like alumina and silicon carbide are deposited on Inconel substrate by pulsed laser deposition technique using Q-switched Nd: YAG laser. Deposited films are characterized using UV-visible spectrophotometry and X-ray diffraction. Composite microhardness of ceramic coated Inconel system is measured using Knoop indenter and its film hardness is separated using a mathematical model based on area-law of mixture. It is then compared with values obtained using nanoindentation method. Film hardness of the ceramic coating is found to be high compared to the substrates. Corrosion behavior of substrates after ceramic coating is studied in 3.5% NaCl solution by potentiodynamic polarization and electrochemical impedance spectroscopy measurements. The Nyquist and the Bode plots obtained from the EIS data are fitted by appropriate equivalent circuits. The pore resistance, the charge transfer resistance, the coating capacitance and the double layer capacitance of the coatings are obtained from the equivalent circuit. Experimental results show an increase in corrosion resistance of Inconel after ceramic coating. Alumina coated Inconel showed higher corrosion resistance than silicon carbide coated Inconel. After the corrosion testing, the surface topography of the uncoated and the coated systems are examined by scanning electron microscopy.

Influence of chemical pretreatment of hard metal substrates for diamond deposition

International Nuclear Information System (INIS)

Buck, V.; Kluwe, H.; Schmiler, B.; Deuerler, F.

2001-01-01

Diamond coated cutting tools are of increasing importance in the fields of high speed cutting, dry machining or machining of special materials such as metal-matrix-composites. A well known problem is the poor adhesion of diamond films on hard metals due to the Co- or Ni-binder that catalyzes the formation of graphite. Several methods - such as the application of intermediate layers or mechanical or chemical pretreatment of the hard metal substrate - have been developed to overcome this effect. Usually chemical pretreatment is used in order to reduce the concentration of binder phase on the surface that is to be coated. Surprisingly pretreatment with agents such as Murakami's solution result in improved adhesion and nucleation of diamond films while the concentration of the binder phase on the surface is enhanced. This 'contradiction' can be explained by proving that the surface is converted into a very thin oxide/hydroxide film. (author)

Ultrathin diamond-like carbon films deposited by filtered carbon vacuum arcs

International Nuclear Information System (INIS)

Anders, Andre; Fong, Walton; Kulkarni, Ashok; Ryan, Francis W.; Bhatia, C. Singh

2001-01-01

Ultrathin ( and lt; 5 nm) hard carbon films are of great interest to the magnetic storage industry as the areal density approaches 100 Gbit/in(sup 2). These films are used as overcoats to protect the magnetic layers on disk media and the active elements of the read-write slider. Tetrahedral amorphous carbon films can be produced by filtered cathodic arc deposition, but the films will only be accepted by the storage industry only if the ''macroparticle'' issue has been solved. Better plasma filters have been developed over recent years. Emphasis is put on the promising twist filter system - a compact, open structure that operates with pulsed arcs and high magnetic field. Based on corrosion tests it is shown that the macroparticle reduction by the twist filter is satisfactory for this demanding application, while plasma throughput is very high. Ultrathin hard carbon films have been synthesized using S-filter and twist filter systems. Film properties such as hardness, elastic modulus, wear, and corrosion resistance have been tested

Mechanical properties of ultra-thin HfO{sub 2} films studied by nano scratches tests

Energy Technology Data Exchange (ETDEWEB)

Fu, Wei-En; Chang, Yong-Qing [Center for Measurement Standards, Industrial Technology Research Institute, Room 216, Building 8, 321, Kuang Fu Road Sec. 2, Hsinchu, Taiwan (China); Chang, Chia-Wei; Yao, Chih-Kai [Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan (China); Liao, Jiunn-Der, E-mail: jdliao@mail.ncku.edu.tw [Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan (China); Center for Micro/Nano Science and Technology, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan (China)

2013-02-01

10-nm-thick atomic layer deposited HfO{sub 2} films were characterized in terms of wear resistance and indentation hardness to investigate the thermal annealing induced impacts on mechanical properties. The wear resistance of ultra-thin films at low loads was characterized using nano-scratch tests with an atomic force microscope. The depth of the nano-scratches decreases with increasing annealing temperature, indicating that the hardness of the annealed films increases with the annealing temperatures. Surface nanoindentation was also performed to confirm the nanoscratch test results. The hardness variation of the annealed films is due to the generation of HfSi{sub x}O{sub y} induced by the thermal annealing. X-ray photoelectron spectroscopy measurements proved that the hardness of formed HfSi{sub x}O{sub y} with increasing annealing temperatures. The existence of HfSi{sub x}O{sub y} broadens the interface, and causes the increase of the interfacial layer thickness. As a result, the surface hardness increases with the increasing HfSi{sub x}O{sub y} induced by the thermal annealing. - Highlights: ► Mechanical properties of HfO{sub 2} films were assessed by nano-scratch and indentation. ► Scratch depth of HfO{sub 2} films decreased with the increase of annealing temperatures. ► Nano-hardness of HfO{sub 2} films increased with the increase of annealing temperatures.

Hard magnetic properties of rapidly annealed NdFeB thin films on Nb and V buffer layers

International Nuclear Information System (INIS)

Jiang, H.; Evans, J.; O'Shea, M.J.; Du Jianhua

2001-01-01

NdFeB thin films of the form A (20 nm)/NdFeB(d nm)/A(20 nm), where d ranges from 54 to 540 nm and the buffer layer A is Nb or V were prepared on a Si(1 0 0) substrate by magnetron sputtering. The hard Nd 2 Fe 14 B phase is formed by a 30 s rapid anneal or a 20 min anneal. Average crystallite size ranged from 20 to 35 nm with the rapidly annealed samples having the smaller crystallite size. These samples also exhibited a larger coercivity and energy product than those treated by a 20 min vacuum anneal. A maximum coercivity of 26.3 kOe at room temperature was obtained for a Nb/NdFeB (180 nm)/Nb film after a rapid anneal at 725 deg. C. Initial magnetization curves indicate magnetization rotation rather than nucleation of reverse domains is important in the magnetization process. A Brown's equation analysis of the coercivity as a function of temperature allowed us to compare the rapidly annealed and 20 min annealed samples. This analysis suggests that rapid annealing gives higher quality crystalline grains than the 20 min annealed sample leading to the observed large coercivity in the rapidly annealed samples

Electronic structure of Al- and Ga-doped ZnO films studied by hard X-ray photoelectron spectroscopy

Directory of Open Access Journals (Sweden)

M. Gabás

2014-01-01

Full Text Available Al- and Ga-doped sputtered ZnO films (AZO, GZO are semiconducting and metallic, respectively, despite the same electronic valence structure of the dopants. Using hard X-ray photoelectron spectroscopy we observe that both dopants induce a band in the electronic structure near the Fermi level, accompanied by a narrowing of the Zn 3d/O 2p gap in the valence band and, in the case of GZO, a substantial shift in the Zn 3d. Ga occupies substitutional sites, whereas Al dopants are in both substitutional and interstitial sites. The latter could induce O and Zn defects, which act as acceptors explaining the semiconducting character of AZO and the lack of variation in the optical gap. By contrast, mainly substitutional doping is consistent with the metallic-like behavior of GZO.

Method for producing fluorinated diamond-like carbon films

Science.gov (United States)

Hakovirta, Marko J.; Nastasi, Michael A.; Lee, Deok-Hyung; He, Xiao-Ming

2003-06-03

Fluorinated, diamond-like carbon (F-DLC) films are produced by a pulsed, glow-discharge plasma immersion ion processing procedure. The pulsed, glow-discharge plasma was generated at a pressure of 1 Pa from an acetylene (C.sub.2 H.sub.2) and hexafluoroethane (C.sub.2 F.sub.6) gas mixture, and the fluorinated, diamond-like carbon films were deposited on silicon substrates. The film hardness and wear resistance were found to be strongly dependent on the fluorine content incorporated into the coatings. The hardness of the F-DLC films was found to decrease considerably when the fluorine content in the coatings reached about 20%. The contact angle of water on the F-DLC coatings was found to increase with increasing film fluorine content and to saturate at a level characteristic of polytetrafluoroethylene.

Iron, nitrogen and silicon doped diamond like carbon (DLC) thin films: A comparative study

Energy Technology Data Exchange (ETDEWEB)

Ray, Sekhar C., E-mail: Raysc@unisa.ac.za [Department of Physics, College of Science, Engineering and Technology, University of South Africa, Private Bag X6, Florida, 1710, Science Campus, Christiaan de Wet and Pioneer Avenue, Florida Park, Johannesburg (South Africa); Pong, W.F. [Department of Physics, Tamkang University, Tamsui 251, New Taipei City, Taiwan (China); Papakonstantinou, P. [Nanotechnology and Integrated Bio-Engineering Centre, University of Ulster, Shore Road, Newtownabbey BT37 0QB (United Kingdom)

2016-07-01

The X-ray absorption near edge structure (XANES), X-ray photoelectron spectroscopy (XPS), valence band photoemission (VB-PES) and Raman spectroscopy results show that the incorporation of nitrogen in pulsed laser deposited diamond like carbon (DLC) thin films, reverts the sp{sup 3} network to sp{sup 2} as evidenced by an increase of the sp{sup 2} cluster and I{sub D}/I{sub G} ratio in C K-edge XANES and Raman spectra respectively which reduces the hardness/Young's modulus into the film network. Si-doped DLC film deposited in a plasma enhanced chemical vapour deposition process reduces the sp{sup 2} cluster and I{sub D}/I{sub G} ratio that causes the decrease of hardness/Young's modulus of the film structure. The Fe-doped DLC films deposited by dip coating technique increase the hardness/Young's modulus with an increase of sp{sup 3}-content in DLC film structure. - Highlights: • Fe, N and Si doped DLC films deposited by dip, PLD and PECVD methods respectively • DLC:Fe thin films have higher hardness/Young's modulus than DLC:N(:Si) thin films. • sp{sup 3} and sp{sup 2} contents are estimated from C K-edge XANES and VB-PES measurements.

Plasma synthesis of hard materials with energetic ions

International Nuclear Information System (INIS)

Monteiro, Othon R.

1999-01-01

Recent developments in plasma synthesis of hard materials using metal plasma immersion ion implantation and deposition are described. We have produced and characterized a variety of films including doped and undoped DLC (diamond-like carbon) and metal carbides. By using multiple plasma sources operated either synchronously or asynchronously, different metal plasma species can be either blended or linked so as to form mixed-composition films or multilayer structures, and by control of the depositing ion energy, interfaces can be made sharp or graded and the film morphology and microstructure can be widely tailored. Plasma compositional uniformity is important to produce homogeneous films, and therefore effective mixing of plasma streams produced by the filtered cathodic vacuum arcs is very important. Specific systems described here include amorphic diamond, and TiC. We outline the deposition technique employed in this investigation, and summarize the results of the characterization of the films

Accompanying of parameters of color, gloss and hardness on polymeric films coated with pigmented inks cured by different radiation doses of ultraviolet light

International Nuclear Information System (INIS)

Gonçalves Bardi, Marcelo Augusto; Brocardo Machado, Luci Diva

2012-01-01

In the search for alternatives to traditional paint systems solvent-based, the curing process of polymer coatings by ultraviolet light (UV) has been widely studied and discussed, especially because of their high content of solids and null emission of VOC. In UV-curing technology, organic solvents are replaced by reactive diluents, such as monomers. This paper aims to investigate variations on color, gloss and hardness of print inks cured by different UV radiation doses. The ratio pigment/clear coating was kept constant. The clear coating presented higher average values for König hardness than pigmented ones, indicating that UV-light absorption has been reduced by the presence of pigments. Besides, they have indicated a slight variation in function of cure degree for the studied radiation doses range. The gloss loss related to UV light exposition allows inferring that some degradation occurred at the surface of print ink films. - Highlights: ► Color, gloss and hardness are directly influenced by the different pigments. ► Clear coating analysis indicates reduction on UV-light absorption. ► Color and gloss indices indicated aeration in function of cure degree.

Surface effects of corrosive media on hardness, friction, and wear of materials

Science.gov (United States)

Miyoshi, K.; Buckley, D. H.; Ishigaki, H.; Rengstorff, G. W. P.

1985-01-01

Hardness, friction, and wear experiments were conducted with magnesium oxide exposed to various corrosive media and also with elemental iron and nickel exposed to water and NaOH. Chlorides such as MgCl2 and sodium containing films were formed on cleaved magnesium oxide surfaces. The MgCl2 films softened the magnesium oxide surfaces and caused high friction and great deformation. Hardness was strongly influenced by the pH value of the HCl-containing solution. The lower the pH, the lower the microhardness. Neither the pH value of nor the immersion time in NaOH containing, NaCl containing, and HNO3 containing solutions influenced the microhardness of magnesium oxide. NaOH formed a protective and low friction film on iron surfaces. The coefficient of friction and the wear for iron were low at concentrations of NaOH higher than 0.01 N. An increase in NaOH concentration resulted in a decrease in the concentration of ferric oxide on the iron surface. It took less NaOH to form a protective, low friction film on nickel than on iron.

Effect of ion implantation on thin hard coatings

International Nuclear Information System (INIS)

Auner, G.; Hsieh, Y.F.; Padmanabhan, K.R.; Chevallier, J.; Soerensen, G.

1983-01-01

The surface mechanical properties of thin hard coatings of carbides, nitrides and borides deposited by r.f. sputtering were improved after deposition by ion implantation. The thickness and the stoichiometry of the films were measured by Rutherford backscattering spectrometry and nuclear reaction analysis before and after ion bombardment. The post ion bombardment was achieved with heavy inert ions such as Kr + and Xe + with an energy sufficient to penetrate the film and to reach the substrate. Both the film adhesion and the microhardness were consistently improved. In order to achieve a more detailed understanding, Rb + and Ni + ions were also used as projectiles, and it was found that these ions were more effective than the inert gas ions. (Auth.)

Ductile film delamination from compliant substrates using hard overlayers.

Science.gov (United States)

Cordill, M J; Marx, V M; Kirchlechner, C

2014-11-28

Flexible electronic devices call for copper and gold metal films to adhere well to polymer substrates. Measuring the interfacial adhesion of these material systems is often challenging, requiring the formulation of different techniques and models. Presented here is a strategy to induce well defined areas of delamination to measure the adhesion of copper films on polyimide substrates. The technique utilizes a stressed overlayer and tensile straining to cause buckle formation. The described method allows one to examine the effects of thin adhesion layers used to improve the adhesion of flexible systems.

Effects of ion beam bombardment of carbon thin films deposited onto tungsten carbide and tool steels

Energy Technology Data Exchange (ETDEWEB)

Awazu, Kaoru; Yoshida, Hiroyuki [Industrial Research Inst. of Ishikawa (Japan); Watanabe, Hiroshi [Gakushuin Univ., Tokyo (Japan); Iwaki, Masaya; Guzman, L [RIKEN, Saitama (Japan)

1992-04-15

A study was made of the effects of argon ion bombardment of carbon thin films deposited onto WC and tool steels. Carbon thin film deposition was performed at various temperatures ranging from 200degC to 350degC, using C{sub 6}H{sub 6} gas. Argon ion beam bombardment of the films was carried out at an energy of 150 keV with a dose of 1x10{sup 16} ions cm{sup -2}. The hardness and adhesion of the films were measured by means of Knoop hardness and scratch tests respectively. The structure of the carbon films was estimated by laser Raman spectroscopy, and the relations were investigated between the mechanical properties and the structure of the films. The hardness of carbon thin films increases as their deposition temperature decreases; this tendency corresponds to the increase in amorphous structure estimated by Raman spectra. Argon ion bombardment results in constant hardness and fraction of amorphous structure. Argon ion beam bombardment of films prior to additional carbon deposition may cause the adhesion of the subsequently deposited films to improve. It is concluded that argon ion beam bombardment is useful for improving the properties of carbon films deposited onto WC and tool steels. (orig.).

Effects of ion beam bombardment of carbon thin films deposited onto tungsten carbide and tool steels

International Nuclear Information System (INIS)

Awazu, Kaoru; Yoshida, Hiroyuki; Watanabe, Hiroshi; Iwaki, Masaya; Guzman, L.

1992-01-01

A study was made of the effects of argon ion bombardment of carbon thin films deposited onto WC and tool steels. Carbon thin film deposition was performed at various temperatures ranging from 200degC to 350degC, using C 6 H 6 gas. Argon ion beam bombardment of the films was carried out at an energy of 150 keV with a dose of 1x10 16 ions cm -2 . The hardness and adhesion of the films were measured by means of Knoop hardness and scratch tests respectively. The structure of the carbon films was estimated by laser Raman spectroscopy, and the relations were investigated between the mechanical properties and the structure of the films. The hardness of carbon thin films increases as their deposition temperature decreases; this tendency corresponds to the increase in amorphous structure estimated by Raman spectra. Argon ion bombardment results in constant hardness and fraction of amorphous structure. Argon ion beam bombardment of films prior to additional carbon deposition may cause the adhesion of the subsequently deposited films to improve. It is concluded that argon ion beam bombardment is useful for improving the properties of carbon films deposited onto WC and tool steels. (orig.)

The microstructure, mechanical and friction properties of protective diamond like carbon films on magnesium alloy

Science.gov (United States)

Zou, Y. S.; Wu, Y. F.; Yang, H.; Cang, K.; Song, G. H.; Li, Z. X.; Zhou, K.

2011-12-01

Protective hard coatings deposited on magnesium alloys are believed to be effective for overcoming their poor wear properties. In this work, diamond-like carbon (DLC) films as hard protective films were deposited on AZ91 magnesium alloy by arc ion plating under negative pulse bias voltages ranging from 0 to -200 V. The microstructure, composition and mechanical properties of the DLC films were analyzed by scanning electron microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and nanoindentation. The tribological behavior of uncoated and coated AZ91 magnesium alloy was investigated using a ball-on-disk tribotester. The results show that the negative pulse bias voltage used for film deposition has a significant effect on the sp3 carbon content and mechanical properties of the deposited DLC films. A maximum sp3 content of 33.3% was obtained at -100 V, resulting in a high hardness of 28.6 GPa and elastic modulus of 300.0 GPa. The DLC films showed very good adhesion to the AZ91 magnesium alloy with no observable cracks and delamination even during friction testing. Compared with the uncoated AZ91 magnesium alloy, the magnesium alloy coated with DLC films exhibits a low friction coefficient and a narrow, shallow wear track. The wear resistance and surface hardness of AZ91 magnesium alloy can be significantly improved by coating a layer of DLC protective film due to its high hardness and low friction coefficient.

The microstructure, mechanical and friction properties of protective diamond like carbon films on magnesium alloy

International Nuclear Information System (INIS)

Zou, Y.S.; Wu, Y.F.; Yang, H.; Cang, K.; Song, G.H.; Li, Z.X.; Zhou, K.

2011-01-01

Protective hard coatings deposited on magnesium alloys are believed to be effective for overcoming their poor wear properties. In this work, diamond-like carbon (DLC) films as hard protective films were deposited on AZ91 magnesium alloy by arc ion plating under negative pulse bias voltages ranging from 0 to -200 V. The microstructure, composition and mechanical properties of the DLC films were analyzed by scanning electron microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and nanoindentation. The tribological behavior of uncoated and coated AZ91 magnesium alloy was investigated using a ball-on-disk tribotester. The results show that the negative pulse bias voltage used for film deposition has a significant effect on the sp 3 carbon content and mechanical properties of the deposited DLC films. A maximum sp 3 content of 33.3% was obtained at -100 V, resulting in a high hardness of 28.6 GPa and elastic modulus of 300.0 GPa. The DLC films showed very good adhesion to the AZ91 magnesium alloy with no observable cracks and delamination even during friction testing. Compared with the uncoated AZ91 magnesium alloy, the magnesium alloy coated with DLC films exhibits a low friction coefficient and a narrow, shallow wear track. The wear resistance and surface hardness of AZ91 magnesium alloy can be significantly improved by coating a layer of DLC protective film due to its high hardness and low friction coefficient.

The microstructure, mechanical and friction properties of protective diamond like carbon films on magnesium alloy

Energy Technology Data Exchange (ETDEWEB)

Zou, Y.S., E-mail: yshzou75@gmail.com [School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu, 210094 (China); Wu, Y.F.; Yang, H.; Cang, K. [School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu, 210094 (China); Song, G.H. [School of Materials Science and Engineering, Shenyang University of Technology, Shenyang, Liaoning, 110178 (China); Li, Z.X.; Zhou, K. [School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu, 210094 (China)

2011-12-01

Protective hard coatings deposited on magnesium alloys are believed to be effective for overcoming their poor wear properties. In this work, diamond-like carbon (DLC) films as hard protective films were deposited on AZ91 magnesium alloy by arc ion plating under negative pulse bias voltages ranging from 0 to -200 V. The microstructure, composition and mechanical properties of the DLC films were analyzed by scanning electron microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and nanoindentation. The tribological behavior of uncoated and coated AZ91 magnesium alloy was investigated using a ball-on-disk tribotester. The results show that the negative pulse bias voltage used for film deposition has a significant effect on the sp{sup 3} carbon content and mechanical properties of the deposited DLC films. A maximum sp{sup 3} content of 33.3% was obtained at -100 V, resulting in a high hardness of 28.6 GPa and elastic modulus of 300.0 GPa. The DLC films showed very good adhesion to the AZ91 magnesium alloy with no observable cracks and delamination even during friction testing. Compared with the uncoated AZ91 magnesium alloy, the magnesium alloy coated with DLC films exhibits a low friction coefficient and a narrow, shallow wear track. The wear resistance and surface hardness of AZ91 magnesium alloy can be significantly improved by coating a layer of DLC protective film due to its high hardness and low friction coefficient.

Hard and transparent hybrid polyurethane coatings using in situ incorporation of calcium carbonate nanoparticles

International Nuclear Information System (INIS)

Yao Lu; Yang Jie; Sun Jing; Cai Lifang; He Linghao; Huang Hui; Song Rui; Hao Yongmei

2011-01-01

Highlights: → In situ mineralization via gas diffusion was adopted for a good dispersion of calcium carbonate nanoparticles in the polymeric PU matrix. → Hybrid films with high dispersion, transparency, robust and thermal stability can be obtained by controlling the CaCO 3 loading. → The hybrid films display a significant improvement in its water resistance, surface hardness, scratch resistance and flexibility, with the introduction of CaCO 3 , and all coatings exhibited excellent chemical resistance and adhesion. - Abstract: The combination of hardness, scratch resistance, and flexibility is a highly desired feature in many coating applications. The aim of this study is to achieve this goal through the in situ introduction of an unmodified calcium carbonate (CaCO 3 ) into a water-soluble polyurethane (PU) matrix. Smooth and (semi-) transparent films were prepared from both the neat PU and the CaCO 3 -filled composites. As evidenced by the measurements from scanning electron microscopy (SEM), optical microscopy, dynamic mechanical analysis (DMA) and thermogravimetric analysis (TGA), hybrid films with high dispersion, transparency, robustness and thermal stability could be obtained by controlling the CaCO 3 loading. The storage modulus could increase from 441 MPa of neat PU matrix to 1034 MPa of hybrid film containing 2% (w/w) CaCO 3 . In addition, the same hybrid films displayed a significant improvement in its water resistance. In this case, the water-uptake ratio decreased from 41.54% of PU to 2.21% of hybrid film containing 2% (w/w) CaCO 3 . Moreover, with the introduction of CaCO 3 , conventional coating characterization methods demonstrated an increase in the surface hardness, scratch resistance and flexibility, and all coatings exhibited excellent chemical resistance and adhesion.

Synchrotron X-ray diffraction studies of phase transitions and mechanical properties of nanocrystalline materials at high pressure

International Nuclear Information System (INIS)

Prilliman, Gerald Stephen

2003-01-01

. The anomalous intensities in the x-ray diffraction patterns were interpreted as being the result of stacking faults, indicating that the mechanism of transition proceeds by the sliding of γ(111) planes to form α(001) planes. The increasing transition pressure for more aggregated samples may be due to a positive activation volume, retarding the transition for nanocrystals with less excess (organic) volume available to them. The lack of a reverse transition upon decompression makes this interpretation more difficult because of the lack of an observable hysteresis, and it is therefore difficult to ascertain kinetic effects for certain. In the case TiN/BN nanocomposite systems, it was found that the bulk modulus (B 0 ) of the TiN nanoparticles was not correlated to the observed hardness or Young's modulus of the macroscopic thin film. This indicates that the origin of the observed super-hard nature of these materials is not due to any change in the Ti-N interatomic potential. Rather, the enhanced hardness must be due to nano-structural effects. It was also found that during pressurization the TiN nanoparticles developed a great deal of strain. This strain can be related to defects induced in individual nanoparticles which generates strain in adjacent particles due to the highly coupled nature of the system

Synchrotron X-ray diffraction studies of phase transitions and mechanical properties of nanocrystalline materials at high pressure

Energy Technology Data Exchange (ETDEWEB)

Prilliman, Stephen Gerald [Univ. of California, Berkeley, CA (United States)

2003-01-01

that must be overridden with pressure. The anomalous intensities in the x-ray diffraction patterns were interpreted as being the result of stacking faults, indicating that the mechanism of transition proceeds by the sliding of γ(111) planes to form α(001) planes. The increasing transition pressure for more aggregated samples may be due to a positive activation volume, retarding the transition for nanocrystals with less excess (organic) volume available to them. The lack of a reverse transition upon decompression makes this interpretation more difficult because of the lack of an observable hysteresis, and it is therefore difficult to ascertain kinetic effects for certain. In the case TiN/BN nanocomposite systems, it was found that the bulk modulus (B₀) of the TiN nanoparticles was not correlated to the observed hardness or Young's modulus of the macroscopic thin film. This indicates that the origin of the observed super-hard nature of these materials is not due to any change in the Ti-N interatomic potential. Rather, the enhanced hardness must be due to nano-structural effects. It was also found that during pressurization the TiN nanoparticles developed a great deal of strain. This strain can be related to defects induced in individual nanoparticles which generates strain in adjacent particles due to the highly coupled nature of the system.

Deposition and Tribological Properties of Sulfur-Doped DLC Films Deposited by PBII Method

Directory of Open Access Journals (Sweden)

Nutthanun Moolsradoo

2010-01-01

Full Text Available Sulfur-doped diamond-like carbon films (S-DLC fabricated from C2H2 and SF6 mixtures were used to study the effects of sulfur content and negative pulse bias voltage on the deposition and tribological properties of films prepared by plasma-based ion implantation (PBII. The structure and relative concentration of the films were analyzed by Raman spectroscopy and Auger electron spectroscopy. Hardness and elastic modulus of films were measured by nanoindentation hardness testing. Tribological characteristics of films were performed using a ball-on-disk friction tester. The results indicate that with the increasing sulfur content, the hardness and elastic modulus decrease. Additionally, by changing the negative pulse bias voltage from 0 kV to −5 kV, the hardness and elastic modulus increase, while the friction coefficient and specific wear rate tends to decrease. Moreover, at a negative pulse bias voltage of −5 kV and flow-rate ratio of 1 : 2, there is considerable improvement in friction coefficient of 0.05 under ambient air is due to the formation of a transfer films on the interface. The decrease in the friction coefficient of films doped with 4.9 at.% sulfur is greater under high vacuum (0.03 than under ambient air (>0.1.

Influence of flow rate on different properties of diamond-like nanocomposite thin films grown by PECVD

Directory of Open Access Journals (Sweden)

T. S. Santra

2012-06-01

Full Text Available Diamond-like nanocomposite (DLN thin films were deposited on pyrex glass substrate using different flow rate of haxamethyldisiloxane (HMDSO based liquid precursor with nitrogen gas as a glow discharged decomposition by plasma enhanced chemical vapor deposition (PECVD technique. The significant influence of different precursor flow rates on refractive index and thickness of the DLN films was measured by using spectroscopic filmatrics and DEKTAK profilometer. Optical transparency of the DLN thin films was analyzed by UV-VIS-NIR spectrometer. FTIR spectroscopy, provides the information about shifted bonds like SiC2, Si-C, Si-O, C-C, Si-H, C-H, N-H, and O-H with different precursor flow rate. We have estimated the hardness of the DLN films from Raman spectroscopy using Gaussian deconvolution method and tried to investigate the correlation between hardness, refractive index and thickness of the films with different precursor flow rates. The composition and surface morphology of the DLN films were investigated by X-ray photo electron spectroscopy (XPS and atomic force microscopy (AFM respectively. We have analyzed the hardness by intensity ratio (ID/IG of D and G peaks and correlates with hardness measurement by nanoindentation test where hardness increases from 27.8 μl/min to 80.6μl/min and then decreases with increase of flow rate from 80.6μl/min to 149.5μl/min. Finally, we correlates different parameters of structural, optical and tribological properties like film-thickness, refractive index, light transmission, hardness, surface roughness, modulus of elasticity, contact angle etc. with different precursor flow rates of DLN films.

Physical Properties and Antibacterial Efficacy of Biodegradable Chitosan Films

OpenAIRE

中島, 照夫

2009-01-01

[Synopsis] Chitin, chitosan and quaternary chitosan films were prepared, and the physical properties and the antibacterial activities of chitosan and quaternary chitosan films were evaluated. The tensile strength of chitin films was 30～40％ lower than that of chitosan films, but the crystallinity of chitin film was much higher than that of chitosan films. The crystallinity and orientation of crystallites were hardly affected by the four kinds of solvent chosen to cast chitosan films, but a de...

Temperature dependent mechanical property of PZT film: an investigation by nanoindentation.

Directory of Open Access Journals (Sweden)

Yingwei Li

Full Text Available Load-depth curves of an unpoled Lead Zirconate Titanate (PZT film composite as a function of temperature were measured by nanoindentation technique. Its reduce modulus and hardness were calculated by the typical Oliver-Pharr method. Then the true modulus and hardness of the PZT film were assessed by decoupling the influence of substrate using methods proposed by Zhou et al. and Korsunsky et al., respectively. Results show that the indentation depth and modulus increase, but the hardness decreases at elevated temperature. The increasing of indentation depth and the decreasing of hardness are thought to be caused by the decreasing of the critical stress needed to excite dislocation initiation at high temperature. The increasing of true modulus is attributed to the reducing of recoverable indentation depth induced by back-switched domains. The influence of residual stress on the indentation behavior of PZT film composite was also investigated by measuring its load-depth curves with pre-load strains.

Temperature dependent mechanical property of PZT film: an investigation by nanoindentation.

Science.gov (United States)

Li, Yingwei; Feng, Shangming; Wu, Wenping; Li, Faxin

2015-01-01

Load-depth curves of an unpoled Lead Zirconate Titanate (PZT) film composite as a function of temperature were measured by nanoindentation technique. Its reduce modulus and hardness were calculated by the typical Oliver-Pharr method. Then the true modulus and hardness of the PZT film were assessed by decoupling the influence of substrate using methods proposed by Zhou et al. and Korsunsky et al., respectively. Results show that the indentation depth and modulus increase, but the hardness decreases at elevated temperature. The increasing of indentation depth and the decreasing of hardness are thought to be caused by the decreasing of the critical stress needed to excite dislocation initiation at high temperature. The increasing of true modulus is attributed to the reducing of recoverable indentation depth induced by back-switched domains. The influence of residual stress on the indentation behavior of PZT film composite was also investigated by measuring its load-depth curves with pre-load strains.

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

International Nuclear Information System (INIS)

Ylivaara, Oili M.E.; Liu, Xuwen; Kilpi, Lauri; Lyytinen, Jussi; Schneider, Dieter; Laitinen, Mikko; Julin, Jaakko; Ali, Saima; Sintonen, Sakari; Berdova, Maria; Haimi, Eero; Sajavaara, Timo; Ronkainen, Helena; Lipsanen, Harri

2014-01-01

Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD enables conformal growth on 3-dimensional structures at relatively low temperatures. For MEMS device design and fabrication, the understanding of stress and mechanical properties such as elastic modulus, hardness and adhesion of thin film is crucial. In this work a comprehensive characterization of the stress, elastic modulus, hardness and adhesion of ALD aluminum oxide (Al 2 O 3 ) films grown at 110–300 °C from trimethylaluminum and water is presented. Film stress was analyzed by wafer curvature measurements, elastic modulus by nanoindentation and surface-acoustic wave measurements, hardness by nanoindentation and adhesion by microscratch test and scanning nanowear. The films were also analyzed by ellipsometry, optical reflectometry, X-ray reflectivity and time-of-flight elastic recoil detection for refractive index, thickness, density and impurities. The ALD Al 2 O 3 films were under tensile stress in the scale of hundreds of MPa. The magnitude of the stress decreased strongly with increasing ALD temperature. The stress was stable during storage in air. Elastic modulus and hardness of ALD Al 2 O 3 saturated to a fairly constant value for growth at 150 to 300 °C, while ALD at 110 °C gave softer films with lower modulus. ALD Al 2 O 3 films adhered strongly on cleaned silicon with SiO x termination. - Highlights: • The residual stress of Al 2 O 3 was tensile and stable during the storage in air. • Elastic modulus of Al 2 O 3 saturated to at 170 GPa for films grown at 150 to 300 °C. • At 110 °C Al 2 O 3 films were softer with high residual hydrogen and lower density. • The Al 2 O 3 adhered strongly on the SiO x -terminated silicon

Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50 kHz/33 MHz dual-frequency atmospheric-pressure plasma jet

Science.gov (United States)

Li, Jiaojiao; Yuan, Qianghua; Chang, Xiaowei; Wang, Yong; Yin, Guiqin; Dong, Chenzhong

2017-04-01

The deposition of organosilicone thin films from hexamethyldisiloxane(HMDSO) by using a dual-frequency (50 kHz/33 MHz) atmospheric-pressure micro-plasma jet with an admixture of a small volume of HMDSO and Ar was investigated. The topography was measured by using scanning electron microscopy. The chemical bond and composition of these films were analyzed by Fourier transform infrared spectroscopy (FTIR) and x-ray photoelectron spectroscopy. The results indicated that the as-deposited film was constituted by silicon, carbon, and oxygen elements, and FTIR suggested the films are organosilicon with the organic component (-CH x ) and hydroxyl functional group(-OH) connected to the Si-O-Si backbone. Thin-film hardness was recorded by an MH-5-VM Digital Micro-Hardness Tester. Radio frequency power had a strong impact on film hardness and the hardness increased with increasing power.

Effect of indium dopant on surface and mechanical characteristics of ZnO : In nanostructured films

Energy Technology Data Exchange (ETDEWEB)

Fang, T.-H.; Kang, S.-H. [Institute of Mechanical and Electromechanical Engineering, National Formosa University, No 64, Wenhua Rd., Huwei, Yunlin 632, Taiwan (China)], E-mail: fang.tehua@msa.hinet.net

2008-12-21

Epitaxial ZnO : In nanorod films were grown on SiO{sub 2} substrates using a chemical solution method with a pre-coated ZnO sputtered seed layer. Structural and surface characterizations of the ZnO : In nanostructured films were achieved by means of x-ray diffraction, a scanning electron microscope, an atomic force microscope and contact angle measurements. The hardness and Young's modulus of the nanostructured films were investigated by nanoindentation measurements. The results showed that when the indium dopant was increased, the hardness and Young's modulus of the films also rose. The films exhibited hydrophobic behaviour with contact angles of about 128-138 deg., and a decrease in the hardness and Young's modulus with decreasing loads or indentation depths. Buckling behaviour took place during the indentation process, and the fracture strength of the films was also discussed.

Hard coatings

International Nuclear Information System (INIS)

Dan, J.P.; Boving, H.J.; Hintermann, H.E.

1993-01-01

Hard, wear resistant and low friction coatings are presently produced on a world-wide basis, by different processes such as electrochemical or electroless methods, spray technologies, thermochemical, CVD and PVD. Some of the most advanced processes, especially those dedicated to thin film depositions, basically belong to CVD or PVD technologies, and will be looked at in more detail. The hard coatings mainly consist of oxides, nitrides, carbides, borides or carbon. Over the years, many processes have been developed which are variations and/or combinations of the basic CVD and PVD methods. The main difference between these two families of deposition techniques is that the CVD is an elevated temperature process (≥ 700 C), while the PVD on the contrary, is rather a low temperature process (≤ 500 C); this of course influences the choice of substrates and properties of the coating/substrate systems. Fundamental aspects of the vapor phase deposition techniques and some of their influences on coating properties will be discussed, as well as the very important interactions between deposit and substrate: diffusions, internal stress, etc. Advantages and limitations of CVD and PVD respectively will briefly be reviewed and examples of applications of the layers will be given. Parallel to the development and permanent updating of surface modification technologies, an effort was made to create novel characterisation methods. A close look will be given to the coating adherence control by means of the scratch test, at the coating hardness measurement by means of nanoindentation, at the coating wear resistance by means of a pin-on-disc tribometer, and at the surface quality evaluation by Atomic Force Microscopy (AFM). Finally, main important trends will be highlighted. (orig.)

Evaluation of the nanomechanical properties of vanadium and native oxide vanadium thin films prepared by RF magnetron sputtering

International Nuclear Information System (INIS)

Mamun, M.A.; Zhang, K.; Baumgart, H.; Elmustafa, A.A.

2015-01-01

Graphical abstract: - Highlights: • V films of 50, 75, 100 nm thickness were deposited on Si by RF magnetron sputtering. • We studied structural/mechanical properties by XRD, FE-SEM, AFM, and nanoindentation. • The hardness increased from 9.0 to 14.0 GPa for 100 to 50 nm. • The modulus showed no correlation with thickness or native oxide formation. • Native oxide formation resulted in grain enlargement and roughness reduction. - Abstract: Polycrystalline vanadium thin films of 50, 75, and 100 nm thickness were deposited by magnetron sputtering of a vanadium metal target of 2 inch diameter with 99.9% purity on native oxide covered Si substrates. One set of the fabricated samples were kept in moisture free environment and the other set was exposed to ambient air at room temperature for a long period of time that resulted in formation of native oxide prior to testing. The crystal structure and phase purity of the vanadium and the oxidized vanadium thin films were characterized by X-ray diffraction (XRD). The XRD results yield a preferential (1 1 0), and (2 0 0) orientation of the polycrystalline V films and (0 0 4) vanadium oxide (V 3 O 7 ). The vanadium films thickness were verified using field emission scanning electron microscopy and the films surface morphologies were inspected using atomic force microscopy (AFM). AFM images reveal surface roughness was observed to increase with increasing film thickness and also subsequent to oxidation at room temperature. The nanomechanical properties were measured by nanoindentation to evaluate the modulus and hardness of the vanadium and the oxidized vanadium thin films. The elastic modulus of the vanadium and the oxidized vanadium films was estimated as 150 GPa at 30% film thickness and the elastic modulus of the bulk vanadium target is estimated as 135 GPa. The measured hardness of the vanadium films at 30% film thickness varies between 9 and 14 GPa for the 100 and 50 nm films, respectively, exhibiting size effects

Work Hard / Play Hard

OpenAIRE

Burrows, J.; Johnson, V.; Henckel, D.

2016-01-01

Work Hard / Play Hard was a participatory performance/workshop or CPD experience hosted by interdisciplinary arts atelier WeAreCodeX, in association with AntiUniversity.org. As a socially/economically engaged arts practice, Work Hard / Play Hard challenged employees/players to get playful, or go to work. 'The game changes you, you never change the game'. Employee PLAYER A 'The faster the better.' Employer PLAYER B

The influence of material hardness on liquid droplet impingement erosion

International Nuclear Information System (INIS)

Fujisawa, Nobuyuki; Yamagata, Takayuki; Takano, Shotaro; Saito, Kengo; Morita, Ryo; Fujiwara, Kazutoshi; Inada, Fumio

2015-01-01

Highlights: • Liquid droplet impingement erosion is studied for various metal materials. • Average power dependency on droplet velocity is found as 7. • Power dependency on Vickers hardness is found as −4.5. • An empirical formula is constructed for erosion rates of metal materials. • Predicted erosion rate is well correlated with experiment within a factor of 1.5. - Abstract: This paper describes the experimental study on the liquid droplet impingement erosion of metal materials to understand the influence of material hardness on the erosion rate. The experiment is carried out using a water spray jet apparatus with a condition of relatively thin liquid film thickness. The metal materials tested are pure aluminum, aluminum alloy, brass, mild steel, carbon steel and stainless steel. The liquid droplets considered are 30 ± 5 μm in volume average diameter of water, which is the same order of droplet diameter in the actual pipeline in nuclear/fossil power plants. In order to understand the influence of material hardness on the liquid droplet impingement erosion, the scanning electron microscope (SEM) observation on the eroded surface and the measurement of erosion rate are carried out in the terminal stage of erosion. The experimental results indicate that the erosion rates are expressed by the droplet velocity, volume flux, Vickers hardness and the liquid film thickness, which are fundamentals of the liquid droplet impingement erosion. The empirical formula shows that the power index for droplet velocity dependency is found to be 7 with a scattering from 5 to 9 depending on the materials, while the power index for Vickers hardness dependency is found as −4.5

The influence of material hardness on liquid droplet impingement erosion

Energy Technology Data Exchange (ETDEWEB)

Fujisawa, Nobuyuki, E-mail: fujisawa@eng.niigata-u.ac.jp [Visualization Research Center, Niigata University, 8050, Ikarashi 2-Nocho, Nishi-ku, Niigata 950-2181 (Japan); Yamagata, Takayuki, E-mail: yamagata@eng.niigata-u.ac.jp [Visualization Research Center, Niigata University, 8050, Ikarashi 2-Nocho, Nishi-ku, Niigata 950-2181 (Japan); Takano, Shotaro; Saito, Kengo [Graduate School of Science and Technology, Niigata University, 8050, Ikarashi 2-Nocho, Nishi-ku, Niigata 950-2181 (Japan); Morita, Ryo; Fujiwara, Kazutoshi; Inada, Fumio [Central Research Institute of Electric Power Industry, 2-11-1, Iwatokita, Komae, Tokyo 201-8511 (Japan)

2015-07-15

Highlights: • Liquid droplet impingement erosion is studied for various metal materials. • Average power dependency on droplet velocity is found as 7. • Power dependency on Vickers hardness is found as −4.5. • An empirical formula is constructed for erosion rates of metal materials. • Predicted erosion rate is well correlated with experiment within a factor of 1.5. - Abstract: This paper describes the experimental study on the liquid droplet impingement erosion of metal materials to understand the influence of material hardness on the erosion rate. The experiment is carried out using a water spray jet apparatus with a condition of relatively thin liquid film thickness. The metal materials tested are pure aluminum, aluminum alloy, brass, mild steel, carbon steel and stainless steel. The liquid droplets considered are 30 ± 5 μm in volume average diameter of water, which is the same order of droplet diameter in the actual pipeline in nuclear/fossil power plants. In order to understand the influence of material hardness on the liquid droplet impingement erosion, the scanning electron microscope (SEM) observation on the eroded surface and the measurement of erosion rate are carried out in the terminal stage of erosion. The experimental results indicate that the erosion rates are expressed by the droplet velocity, volume flux, Vickers hardness and the liquid film thickness, which are fundamentals of the liquid droplet impingement erosion. The empirical formula shows that the power index for droplet velocity dependency is found to be 7 with a scattering from 5 to 9 depending on the materials, while the power index for Vickers hardness dependency is found as −4.5.

The microstructure and mechanical properties of multilayer diamond-like carbon films with different modulation ratios

International Nuclear Information System (INIS)

Xu Zhaoying; Zheng, Y.J.; Jiang, F.; Leng, Y.X.; Sun Hong; Huang Nan

2013-01-01

Highlights: ► The multilayer DLC films with different modulation ratios have been fabricated by FCVA. ► The multilayer DLC films can effectively decrease the residual stress of the DLC films. ► The multilayer DLC film with modulation ratio of 1:1 shows the best wear resistance. - Abstract: The multilayer DLC films consisting of sp 2 -rich DLC layers (soft DLC) and sp 3 -rich DLC layers (hard DLC) with different modulation ratios (thickness ratio of the hard DLC to soft DLC) ranging from 2:1, 1:1 to 1:2 had been deposited on Si (1 0 0) wafer and Ti–6Al–4V alloy substrates by filtered cathodic vacuum arc (FCVA) deposition. The effect of modulation ratio on the microstructure and properties of the multilayer DLC films including sp 3 content, residual stress, mechanical properties, adhesion strength and wear resistance were studied by Raman spectroscopy, profilometry technique, nanoindenter, Vickers indentation test, scanning electron microscopy (SEM) and ball-on-disc reciprocating friction test. The results showed that the sp 3 content and the hardness of the multilayer DLC films decreased with modulation ratios decreasing. The stress of the multilayer DLC films could be effectively reduced and the stress decreased with the modulation ratio decreasing. The multilayer DLC film with modulation ratio of 1:1 had the best wear resistance due to a balance between hardness and residual stress.

Deposition of amorphous carbon films using Ar and/or N{sub 2} magnetron sputter with ring permanent magnet

Energy Technology Data Exchange (ETDEWEB)

Kinoshita, Haruhisa, E-mail: rdhkino@ipc.shizuoka.ac.jp; Kubota, Masaya; Ohno, Genji

2012-11-15

Magnetron sputter with a rotating ring permanent magnet using Ar and/or N{sub 2} gases were first used to form amorphous carbon (a-C and a-CN{sub x}) films on p-Si wafers set on a grounded lower electrode. The a-C film was hard while the a-CN{sub x} films were soft. These films include a little O and H atoms unintentionally. Optical band gap, refractive index, Fourier transform infrared spectroscopy absorption spectra, hardness and field emission threshold electric field were significantly different between a-C and a-CN{sub x} films. The optical band gap of the a-C film was 0.7 eV while those of a-CN{sub x} films were almost constant at about 1.25 eV. The low field emission threshold electric field of 13 V/{mu}m was obtained in hard a-C film.

Tribological Behaviour of Ti:Ta-DLC Films Under Different Tribo-Test Conditions

Science.gov (United States)

Efeoglu, İhsan; Keleş, Ayşenur; Totik, Yaşar; Çiçek, Hikmet; Emine Süküroglu, Ebru

2018-01-01

Diamond-like carbon (DLC) films are suitable applicants for cutting tools due to their high hardness, low friction coefficient and wear rate. Doping metals in DLC films have been improved its tribological properties. In this study, titanium and tantalum doped hydrogenated DLC films were deposited by closed-field unbalanced magnetron sputtering system onto M2 high speed steels in Ar/N2/C2H2 atmosphere. The friction and wear properties of Ti:Ta-DLC film were investigated under different tribo-test conditions including in atmospheric pressure, distilled water, commercial oil and Ar atmosphere. The coated specimens were characterized by SEM and X-ray diffraction techniques. The bonding state of C-C (sp3) and C=C (sp2) were obtained with XPS. The tribological properties of Ti:Ta-DLC were investigated with pin-on-disc wear test. Hardness measurements performed by micro-indentation. Our results suggest that Ti:Ta-doped DLC film shows very dense columnar microstructure, high hardness (38.2 GPa) with low CoF (µ≈0.02) and high wear resistance (0.5E-6 mm3/Nm).

Effects of plasma-deposited silicon nitride passivation on the radiation hardness of CMOS integrated circuits

International Nuclear Information System (INIS)

Clement, J.J.

1980-01-01

The use of plasma-deposited silicon nitride as a final passivation over metal-gate CMOS integrated circuits degrades the radiation hardness of these devices. The hardness degradation is manifested by increased radiation-induced threshold voltage shifts caused principally by the charging of new interface states and, to a lesser extent, by the trapping of holes created upon exposure to ionizing radiation. The threshold voltage shifts are a strong function of the deposition temperature, and show very little dependence on thickness for films deposited at 300 0 C. There is some correlation between the threshold voltage shifts and the hydrogen content of the PECVD silicon nitride films used as the final passivation layer as a function of deposition temperature. The mechanism by which the hydrogen contained in these films may react with the Si/SiO 2 interface is not clear at this point

Hardness Enhancement of STS304 Deposited with Yttria Stabilized Zirconia by Aerosol Deposition Method

Energy Technology Data Exchange (ETDEWEB)

Lim, Il-Ho; Park, Chun-Kil; Kim, Hyung Sun; Jeong, Dea-Yong [Inha University, Incheon (Korea, Republic of); Lee, Yong-Seok [Sodoyeon Co., Yeoju (Korea, Republic of); Kong, Young-Min [University of Ulsan, Ulsan (Korea, Republic of); Kang, Kweon Ho [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)

2016-03-15

To improve the surface hardness of the STS304, Yttria stabilized zirconia (YSZ) films with nano-sized grain were deposited by an aerosol-deposition (AD) method. Coating layers showed dense structure and had -5µm thickness. When 3 mol% YSZ powders with tetragonal phase were deposited on STS304 substrate, tetragonal structure was transformed to cubic structure due to the high impact energy during the AD process. At the same time, strong impact by YSZ particles allowed the austenite phase in STS304 to be transformed into martensite phase. Surface hardness measured with nano indentor showed that YSZ coated film had 11.5 GPa, which is larger value than 7 GPa of STS304.

Template-mediated, Hierarchical Engineering of Ordered Mesoporous Films and Powders

Science.gov (United States)

Tian, Zheng

Hierarchical control over pore size, pore topology, and meso/mictrostructure as well as material morphology (e.g., powders, monoliths, thin films) is crucial for meeting diverse materials needs among applications spanning next generation catalysts, sensors, batteries, sorbents, etc. The overarching goal of this thesis is to establish fundamental mechanistic insight enabling new strategies for realizing such hierarchical textural control for carbon materials that is not currently achievable with sacrificial pore formation by 'one-pot' surfactant-based 'soft'-templating or multi-step inorganic 'hard-templating. While 'hard'-templating is often tacitly discounted based upon its perceived complexity, it offers potential for overcoming key 'soft'-templating challenges, including bolstering pore stability, accommodating a more versatile palette of replica precursors, realizing ordered/spanning porosity in the case of porous thin films, simplifying formation of bi-continuous pore topologies, and inducing microstructure control within porous replica materials. In this thesis, we establish strategies for hard-templating of hierarchically porous and structured carbon powders and tunable thin films by both multi-step hard-templating and a new 'one-pot' template-replica precursor co-assembly process. We first develop a nominal hard-templating technique to successfully prepare three-dimensionally ordered mesoporous (3DOm) and 3DOm-supported microporous carbon thin films by exploiting our ability to synthesize and assemble size-tunable silica nanoparticles into scalable, colloidal crystalline thin film templates of tunable mono- to multi-layer thickness. This robust thin film template accommodates liquid and/or vapor-phase infiltration, polymerization, and pyrolysis of various carbon sources without pore contraction and/or collapse upon template sacrifice. The result is robust, flexible 3DOm or 3DOm-supported ultra-thin microporous films that can be transferred by stamp

Grain boundaries and mechanical properties of nanocrystalline diamond films.

Energy Technology Data Exchange (ETDEWEB)

Busmann, H.-G.; Pageler, A.; Gruen, D. M.

1999-08-06

Phase-pure nanocrystalline diamond thin films grown from plasmas of a hydrogen-poor carbon argon gas mixture have been analyzed regarding their hardness and elastic moduli by means of a microindentor and a scanning acoustic microscope.The films are superhard and the moduli rival single crystal diamond. In addition, Raman spectroscopy with an excitation wavelength of 1064 nm shows a peak at 1438 l/cm and no peak above 1500 l/cm, and X-ray photoelectron spectroscopy a shake-up loss at 4.2 eV. This gives strong evidence for the existence of solitary double bonds in the films. The hardness and elasticity of the films then are explained by the assumption, that the solitary double bonds interconnect the nanocrystals in the films, leading to an intergrain boundary adhesion of similar strength as the intragrain diamond cohesion. The results are in good agreement with recent simulations of high-energy grain boundaries.

Structural characterization of thin films of titanium nitride deposited by laser ablation

International Nuclear Information System (INIS)

Castro C, M.A.; Escobar A, L.; Camps C, E.; Mejia H, J.A.

2004-01-01

Thin films of titanium nitride were deposited using the technique of laser ablation. It was studied the effect of the density of laser energy used for ablation the target as well as of the pressure of the work gas about the structure and the hardness of the deposited thin films. Depending on the pressure of the work gas films was obtained with preferential orientation in the directions (200) and (111). At a pressure of 1 x 10 -2 Torr only the direction (200) was observed. On the other hand to the pressure of 5 x 10 -3 Torr the deposited material this formed by a mixture of the orientation (200) and (111), being the direction (111) the predominant one. Thin films of Ti N were obtained with hardness of up to 24.0 GPa that makes to these attractive materials for mechanical applications. The hardness showed an approximately linear dependence with the energy density. (Author)

Integration of Radiation-Hard Magnetic Random Access Memory with CMOS ICs

CERN Document Server

Cerjan, C J

2000-01-01

The research undertaken in this LDRD-funded project addressed the joint development of magnetic material-based nonvolatile, radiation-hard memory cells with Sandia National Laboratory. Specifically, the goal of this project was to demonstrate the intrinsic radiation-hardness of Giant Magneto-Resistive (GMR) materials by depositing representative alloy combinations upon radiation-hardened silicon-based integrated circuits. All of the stated goals of the project were achieved successfully. The necessary films were successfully deposited upon typical integrated circuits; the materials retained their magnetic field response at the highest radiation doses; and a patterning approach was developed that did not degrade the as-fabricated properties of the underlying circuitry. These results establish the feasibility of building radiation-hard magnetic memory cells.

Nanomechanical properties of SiC films grown from C{sub 60} precursors using atomic force microscopy

Energy Technology Data Exchange (ETDEWEB)

Morse, K. [Colorado School of Mines, Golden, CO (United States); Balooch, M.; Hamza, A.V.; Belak, J. [Lawrence Livermore National Lab., CA (United States)

1994-12-01

The mechanical properties of SiC films grown via C{sub 60} precursors were determined using atomic force microscopy (AFM). Conventional silicon nitride and modified diamond cantilever AFM tips were employed to determine the film hardness, friction coefficient, and elastic modulus. The hardness is found to be between 26 and 40 GPa by nanoindentation of the film with the diamond tip. The friction coefficient for the silicon nitride tip on the SiC film is about one third that for silicon nitride sliding on a silicon substrate. By combining nanoindentation and AFM measurements an elastic modulus of {approximately}300 GPa is estimated for these SiC films. In order to better understand the atomic scale mechanisms that determine the hardness and friction of SiC, we simulated the molecular dynamics of a diamond indenting a crystalline SiC substrate.

Measurement of hydrogen in BCN films by nuclear reaction analysis

Energy Technology Data Exchange (ETDEWEB)

Yasui, Haruyuki; Hirose, Yukio; Sasaki, Toshihiko [Kanazawa Univ. (Japan); Awazu, Kaoru [Industrial Research Inst., of Ishikawa, Kanazawa (Japan); Naramoto, Hiroshi [Japan Atomic Energy Research Inst., Takasaki, Gunma (Japan). Takasaki Radiation Chemistry Research Establishment

2001-07-01

Hydrogen is a very common contaminant in carbon films. It can strongly influence on mechanical, physical and chemical properties of the films. The analysis of hydrogen is therefore a crucial problem produce the films with the properties required. Ion beam techniques using nuclear reactions are effective for the quantitative determination of hydrogen concentration. A specially designed spectrometer is employed for the detailed determination of hydrogen concentrations by detecting 4.43MeV {gamma}-rays from the resonant nuclear reactions {sup 1}H({sup 15}N, {alpha}{gamma}){sup 12}C at the 6.385MeV. In this study, the BCN films were formed on silicon substrate by ion beam assisted deposition (IBAD), in which boron and carbon were deposited by electron beam heating of B{sub 4}C solid and nitrogen was supplied by ion implantation simultaneously. The concentrations of hydrogen in BCN films were measured using RNRA. The mechanical properties of BCN films were evaluated using an ultra-micro-hardness tester. It was confirmed that the hardness of BCN films increased with increasing the concentration of hydrogen. (author)

High-coercivity FePt sputtered films

International Nuclear Information System (INIS)

Luong, N.H.; Hiep, V.V.; Hong, D.M.; Chau, N.; Linh, N.D.; Kurisu, M.; Anh, D.T.K.; Nakamoto, G.

2005-01-01

Fe 56 Pt 44 thin films have been prepared by RF magnetron sputtering on Si substrates. The substrate temperature was kept at 350 deg C. The X-ray diffraction patterns of as-deposited FePt films exhibited a disordered structure. Annealing of the films at 650-685 deg C for 1 h yielded an ordered L1 0 phase with FCT structure. The high value for coercivity H C of 17 kOe was obtained at room temperature for the 68 nm thick film annealed at 685 deg C. The hard magnetic properties as well as grain structure of the films strongly depend on the annealing conditions

Progress of Diamond-like Carbon Films

Directory of Open Access Journals (Sweden)

CHEN Qing-yun

2017-03-01

Full Text Available Diamond-like carbon(DLC films had many unique and outstanding properties such as high thermal conductivity, high hardness, excellent chemical inertness, low friction coefficients and wear coefficients. The properties and combinations were very promising for heat sink, micro-electromechanical devices, radiation hardening, biomedical devices, automotive industry and other technical applications, more research and a lot of attention were attracted in recent years. The research progress of diamond-like films and the nucleation mechanism of film were summarized, and application prospect of DLC films were demonstrated. The aim of this paper is to provide insights on the research trend of DLC films and the industry applications.

Influence of residual Ar+ in Ar cluster ion beam for DLC film formation

International Nuclear Information System (INIS)

Kitagawa, Teruyuki; Miyauchi, Kazuya; Toyoda, Noriaki; Kanda, Kazuhiro; Ikeda, Tokumi; Tsubakino, Harushige; Matsuo, Jiro; Matsui, Shinji; Yamada, Isao

2003-01-01

In order to study the influences of residual Ar monomer ion (Ar + ) on sp 2 content and hardness of diamond like carbon (DLC) films formed by Ar cluster ion beam assisted deposition, Ar cluster ion, Ar + and their mixed ions (Ar cluster ion and Ar + ) bombardments were performed during evaporation of C 60 . From near edge X-ray absorption fine structure (NEXAFS) and Raman spectroscopy measurements, lower sp 2 content in the carbon films was obtained with Ar cluster ion bombardment than that with Ar + and mixed ion. Furthermore higher hardness and smooth surface were shown with Ar cluster ion bombardments. Therefore it was important to reduce Ar + in Ar cluster ion beams to obtain hard DLC films with flat surface

Metal oxide multilayer hard mask system for 3D nanofabrication

Science.gov (United States)

Han, Zhongmei; Salmi, Emma; Vehkamäki, Marko; Leskelä, Markku; Ritala, Mikko

2018-02-01

We demonstrate the preparation and exploitation of multilayer metal oxide hard masks for lithography and 3D nanofabrication. Atomic layer deposition (ALD) and focused ion beam (FIB) technologies are applied for mask deposition and mask patterning, respectively. A combination of ALD and FIB was used and a patterning procedure was developed to avoid the ion beam defects commonly met when using FIB alone for microfabrication. ALD grown Al2O3/Ta2O5/Al2O3 thin film stacks were FIB milled with 30 keV gallium ions and chemically etched in 5% tetramethylammonium hydroxide at 50 °C. With metal evaporation, multilayers consisting of amorphous oxides Al2O3 and Ta2O5 can be tailored for use in 2D lift-off processing, in preparation of embedded sub-100 nm metal lines and for multilevel electrical contacts. Good pattern transfer was achieved by lift-off process from the 2D hard mask for micro- and nano-scaled fabrication. As a demonstration of the applicability of this method to 3D structures, self-supporting 3D Ta2O5 masks were made from a film stack on gold particles. Finally, thin film resistors were fabricated by utilizing controlled stiction of suspended Ta2O5 structures.

Corrosion performance of some titanium-based hard coatings

International Nuclear Information System (INIS)

Matthes, B.; Broszeit, E.; Aromaa, J.; Ronkainen, H.; Hannula, S.P.; Leyland, A.; Matthews, A.

1991-01-01

Tools and machine parts which could benefit from wear-resistant titanium-based hard films are often subject to corrosive environments. Physically vapour-deposited coatings frequently exhibit porosity and even small defects, which can cause rapid local corrosion of the substrate material; there is therefore a requirement for dense and chemically inert coatings. This paper presents corrosion data for titanium-based hard coatings such as TiN, (Ti, Al)N, Ti(B, N) and TiB 2 and also for multilayered structures where additional aluminium-based insulating surface layers (AlN and Al 2 O 3 ) were deposited. The corrosion resistance and porosity of the films were analysed by electrochemical techniques. The degree of metallic bonding can play a significant role in influencing the corrosion resistance of refractory transition-metal-based ceramic coatings. Here we demonstrate that, under potentiodynamic corrosion test conditions, resistance to corrosive attack was relatively poor for TiB 2 , better for (Ti, Al)N and Ti(B, N) and best for TiN. It is also shown that applying the additional protective aluminium-based insulating surface layers on the coating can further improve corrosion resistance. (orig.)

Nanomechanical Behavior of High Gas Barrier Multilayer Thin Films.

Science.gov (United States)

Humood, Mohammad; Chowdhury, Shahla; Song, Yixuan; Tzeng, Ping; Grunlan, Jaime C; Polycarpou, Andreas A

2016-05-04

Nanoindentation and nanoscratch experiments were performed on thin multilayer films manufactured using the layer-by-layer (LbL) assembly technique. These films are known to exhibit high gas barrier, but little is known about their durability, which is an important feature for various packaging applications (e.g., food and electronics). Films were prepared from bilayer and quadlayer sequences, with varying thickness and composition. In an effort to evaluate multilayer thin film surface and mechanical properties, and their resistance to failure and wear, a comprehensive range of experiments were conducted: low and high load indentation, low and high load scratch. Some of the thin films were found to have exceptional mechanical behavior and exhibit excellent scratch resistance. Specifically, nanobrick wall structures, comprising montmorillonite (MMT) clay and polyethylenimine (PEI) bilayers, are the most durable coatings. PEI/MMT films exhibit high hardness, large elastic modulus, high elastic recovery, low friction, low scratch depth, and a smooth surface. When combined with the low oxygen permeability and high optical transmission of these thin films, these excellent mechanical properties make them good candidates for hard coating surface-sensitive substrates, where polymers are required to sustain long-term surface aesthetics and quality.

Deposit of thin films of TiN, a-C, Ti/TiN/a-C by laser ablation

International Nuclear Information System (INIS)

Mejia, I.S.; Escobar A, L.; Camps, E.; Romero, S.; Muhl, S.

2006-01-01

Thin films of titanium nitride (TiN), amorphous carbon (a-C), as well as bilayers of Ti/TiN/a-C were deposited by means of the laser ablation technique. It was investigated the effect that it has the laser fluence used to ablation the targets in the structure and mechanical properties of the TiN deposited films. The TiN obtained films have a preferential orientation in the direction (200). The results show that the hardness of this material is influenced by the laser fluence. It is observed that the hardness is increased in an approximately lineal way with the increment of the fluence up to 19 J/cm 2 . The films of amorphous carbon present hardness of the order of 11.2 GPa. Likewise it was found that the multilayers of Ti/TiN/aC presented a bigger hardness that of its individual components. (Author)

Stress development in thin yttrium films on hard substrates during hydrogen loading

International Nuclear Information System (INIS)

Dornheim, M.; Pundt, A.; Kirchheim, R.; Molen, S. J. v. d.; Kooij, E. S.; Kerssemakers, J.; Griessen, R.; Harms, H.; Geyer, U.

2003-01-01

Polycrystalline (0002)-textured yttrium (Y) films of 50-500 nm thickness on sapphire substrates were loaded electrolytically with hydrogen (H). The stresses which build up in these films were measured in situ using curvature measurements. The results are compared to the behavior of bulk Y-H. A linear elastic model is used to predict the behavior of clamped thin films. Basic properties of the bulk Y-H phase diagram and elastic constants resemble the measured values of the thin films. Compressive stress builds up during H-loading in the α-Y phase and in the (α-Y+β-YH 2 ) two-phase field, showing an initial stress increase of -1.3 GPa per hydrogen concentration X H (compressive stress). While bulk Y-H samples are known to show a contraction in the β-YH 2 phase during H loading, thin films show no evidence for such a contraction during the first loading cycle of the film. The stress remains constant in the bulk β-phase concentration range (ΔX H =0.1 H/Y). This is attributed to the narrow β-phase field (ΔX H =0.02 H/Y) of the thin film during the first loading. Only samples which have been kept at a hydrogen concentration of about 1.5 H/Y for weeks show tensile stress in the concentration range of the bulk β phase. Amazingly a stress increase of about +0.5 GPa/X H (tensile stress) is measured in the β+γ two-phase field. This is attributed to the smaller in-plane nearest-neighbor distance in the γ phase compared to the β phase. In the γ-phase field compressive stress is built up again, compensating the tensile stress. It increases by -1.3 GPa/X H . In total, the net stress in Y-H films remains comparably small. This could be a reason for the good mechanical stability of such Y-H switchable mirrors during H cycling

Removal of hard COD, nitrogenous compounds and phenols from a ...

African Journals Online (AJOL)

The objective of this study was to identify the factors affecting the suspended and fixed biomass in the removal of hard COD, nitrogenous compounds and phenols from a coal gasification wastewater (CGWW) stream using a hybrid fixed-film bioreactor (H-FFBR) process under real-time plant operational conditions and ...

Stoichiometry and characterization of aluminum oxynitride thin films grown by ion-beam-assisted pulsed laser deposition

Energy Technology Data Exchange (ETDEWEB)

Zabinski, J.S. [Materials and Manufacturing Directorate, Air Force Research Laboratory (AFRL), Wright-Patterson Air Force Base, Dayton, Ohio 45433 (United States); Hu, J.J. [Materials and Manufacturing Directorate, Air Force Research Laboratory (AFRL), Wright-Patterson Air Force Base, Dayton, Ohio 45433 (United States)], E-mail: Jianjun.Hu@WPAFB.AF.MIL; Bultman, J.E. [Materials and Manufacturing Directorate, Air Force Research Laboratory (AFRL), Wright-Patterson Air Force Base, Dayton, Ohio 45433 (United States); Pierce, N.A. [Propulsion Directorate, Air Force Research Laboratory (AFRL), Wright-Patterson Air Force Base, Dayton, Ohio 45433 (United States); Voevodin, A.A. [Materials and Manufacturing Directorate, Air Force Research Laboratory (AFRL), Wright-Patterson Air Force Base, Dayton, Ohio 45433 (United States)

2008-07-31

Oxides are inherently stable in air at elevated temperatures and may serve as wear resistant matrices for solid lubricants. Aluminum oxide is a particularly good candidate for a matrix because it has good diffusion barrier properties and modest hardness. Most thin film deposition techniques that are used to grow alumina require high temperatures to impart crystallinity. Crystalline films are about twice as hard as amorphous ones. Unfortunately, the mechanical properties of most engineering steels are degraded at temperatures above 250-350 deg. C. This work is focused on using energetic reactive ion bombardment during simultaneous pulsed laser deposition to enhance film crystallization at low temperatures. Alumina films were grown at several background gas pressures and temperatures, with and without Ar ion bombardment. The films were nearly stoichiometric except for depositions in vacuum. Using nitrogen ion bombardment, nitrogen was incorporated into the films and formed the Al-O-N matrix. Nitrogen concentration could be controlled through selection of gas pressure and ion energy. Crystalline Al-O-N films were grown at 330 deg. C with a negative bias voltage to the substrate, and showed improved hardness in comparison to amorphous films.

Superhard PVD carbon films deposited with different gradients with and without additions of titanium and silicon

International Nuclear Information System (INIS)

Bauer, C.

2003-10-01

This work focusses on thin carbon-based films, deposited by magnetron sputtering with additional argon ion bombardment (0 eV to 800 eV) without extra adhesive layer on hard metal inserts. As one possibility of increasing the reduced adherence of hard carbon films the deposition of films with additions of titanium and silicon is studied. The aim of this work is to examine the influence of a modification of the transition between substrate and film by realizing three different types of deposition gradients. The pure carbon films are amorphous, the dominant network of atoms is formed by sp 2 bonded atoms. The amount of sp 3 bonded atoms is up to 30% and is influenced by the bombarding argon ion energy. Carbon films with additions of silicon are amorphous, only in films with a high amount of titanium (approx. 20 at%) nanocomposites of titanium carbide crystals with diameters of less than 5 nm in an amorphous carbon matrix were found. The mechanical properties and the behavior of single layer carbon films strongly depend on the argon ion energy. An increase of this energy leads to higher film hardness and higher residual stress and results in the delamination of superhard carbon films on hard metal substrates. The adhesion of single layer films for ion energies of more than 200 eV is significantly improved by additions of titanium and silicon, respectively. The addition of 23 at% silicon and titanium, respectively leads to a high reduction of the residual stress. In a non-reactive PVD process thin films were deposited with a continuously gradient in chemical composition. The results of the investigations of the films with two different concentrations of titanium and silicon, respectively show that carbon-based films with a good adhesion could be deposited. The combination of the two gradients in structure and properties and in chemical composition leads in the system with carbon and silicon carbide to hard and very adhesive films. Especially for carbon films with a high

Study on nanocomposite Ti-Al-Si-Cu-N films with various Si contents deposited by cathodic vacuum arc ion plating

Energy Technology Data Exchange (ETDEWEB)

Shi, J. [State Key Laboratory of Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016 (China); Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Strasse 9-11, Siegen 57076 (Germany); Muders, C.M.; Kumar, A. [Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Strasse 9-11, Siegen 57076 (Germany); Jiang, X., E-mail: xin.jiang@uni-siegen.de [Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Strasse 9-11, Siegen 57076 (Germany); Pei, Z.L.; Gong, J. [State Key Laboratory of Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016 (China); Sun, C., E-mail: csun@imr.ac.cn [State Key Laboratory of Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016 (China)

2012-10-01

Highlights: Black-Right-Pointing-Pointer XRD peaks show a tendency of decreasing intensity with increasing Si content. Black-Right-Pointing-Pointer Ti-Al-Si-Cu-N films present different microstructure with increasing Si content. Black-Right-Pointing-Pointer Films with 6 at.% Si content obtain the highest hardness, elastic modulus and H{sup 3}/E{sup 2}. Black-Right-Pointing-Pointer The wear rate decreases with an increase in hardness. - Abstract: In this study, nanocomposite Ti-Al-Si-Cu-N films were deposited on high speed steel substrates by the vacuum cathode arc ion plating (AIP) technique. By virtue of X-ray diffraction (XRD) analysis, X-ray photoelectron spectroscopy (XPS), and field emission scanning electron microscopy (FESEM), the influence of silicon content on the film microstructure and characteristics was investigated systematically, including the chemical composition, crystalline structure as well as cross-section morphologies. With increasing the silicon content, a deterioration of the preferred orientation and a dense globular structure were detected. In the meanwhile, atomic force microscopy (AFM), nano-indentation, Rockwell indenter and reciprocating test were also utilized to analyze the hardness, elastic modulus, H{sup 3}/E{sup 2}, friction coefficient, adhesive strength and wear rate of the Ti-Al-Si-Cu-N films. The results showed that an optimal silicon content correlated with the best mechanical and tribological properties of the presented Ti-Al-Si-Cu-N films existed. With increasing the silicon content, the hardness, elastic modulus and the ratio H{sup 3}/E{sup 2} first were improved gradually, and then were impaired sharply again. When the silicon content reached to 6 at.%, the film possessed the highest hardness, elastic modulus and ratio H{sup 3}/E{sup 2} of approximately 24 GPa, 218 GPa and 0.31, respectively. Besides, films containing both 6 at.% and 10 at.% Si contents obtained a relatively low friction coefficient and a good adhesive

Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

International Nuclear Information System (INIS)

Santra, T. S.; Liu, C. H.; Bhattacharyya, T. K.; Patel, P.; Barik, T. K.

2010-01-01

Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of C-C, C-H, Si-C, and Si-H bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio I D /I G . Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

Reliability assessment of ultra-thin HfO2 films deposited on silicon wafer

International Nuclear Information System (INIS)

Fu, Wei-En; Chang, Chia-Wei; Chang, Yong-Qing; Yao, Chih-Kai; Liao, Jiunn-Der

2012-01-01

Highlights: ► Nano-mechanical properties on annealed ultra-thin HfO 2 film are studied. ► By AFM analysis, hardness of the crystallized HfO 2 film significantly increases. ► By nano-indention, the film hardness increases with less contact stiffness. ► Quality assessment on the annealed ultra-thin films can thus be achieved. - Abstract: Ultra-thin hafnium dioxide (HfO 2 ) is used to replace silicon dioxide to meet the required transistor feature size in advanced semiconductor industry. The process integration compatibility and long-term reliability for the transistors depend on the mechanical performance of ultra-thin HfO 2 films. The criteria of reliability including wear resistance, thermal fatigue, and stress-driven failure rely on film adhesion significantly. The adhesion and variations in mechanical properties induced by thermal annealing of the ultra-thin HfO 2 films deposited on silicon wafers (HfO 2 /SiO 2 /Si) are not fully understood. In this work, the mechanical properties of an atomic layer deposited HfO 2 (nominal thickness ≈10 nm) on a silicon wafer were characterized by the diamond-coated tip of an atomic force microscope and compared with those of annealed samples. The results indicate that the annealing process leads to the formation of crystallized HfO 2 phases for the atomic layer deposited HfO 2 . The HfSi x O y complex formed at the interface between HfO 2 and SiO 2 /Si, where the thermal diffusion of Hf, Si, and O atoms occurred. The annealing process increases the surface hardness of crystallized HfO 2 film and therefore the resistance to nano-scratches. In addition, the annealing process significantly decreases the harmonic contact stiffness (or thereafter eliminate the stress at the interface) and increases the nano-hardness, as measured by vertically sensitive nano-indentation. Quality assessments on as-deposited and annealed HfO 2 films can be thereafter used to estimate the mechanical properties and adhesion of ultra-thin HfO 2

Sputter deposition and characterisation of hard wear-resistant Ti/TiN multilayers

Energy Technology Data Exchange (ETDEWEB)

Simmonds, M.C.; Swygenhoven, H. van [Paul Scherrer Inst. (PSI), Villigen (Switzerland)

1997-09-01

Multilayered Ti/TiN thin films have been synthesized by magnetron sputter deposition. Alternating layers of Ti and TiN with layer thickness in the 5-50 nm range are sequentially deposited. The structure of the films have been characterised by atomic force microscopy (AFM), X-ray diffraction and reflection and Auger depth profiling. The mechanical properties have been investigated using pin-on-disc wear rate testing, nanoindentation determination of hardness and micro scratch testing. (author) 1 fig., 3 refs.

Laser micromachining of sputtered DLC films

International Nuclear Information System (INIS)

Fu, Y.Q.; Luo, J.K.; Flewitt, A.J.; Ong, S.E.; Zhang, S.; Milne, W.I.

2006-01-01

DLC films with different thicknesses (from 100 nm to 1.9 μm) were deposited using sputtering of graphite target in pure argon atmosphere without substrate heating. Film microstructures (sp 2 /sp 3 ratio) and mechanical properties (modulus, hardness, stress) were characterized as a function of film thickness. A thin layer of aluminum about 60 nm was deposited on the DLC film surface. Laser micromachining of Al/DLC layer was performed to form microcantilever structures, which were released using a reactive ion etching system with SF 6 plasma. Due to the intrinsic stress in DLC films and bimorph Al/DLC structure, the microcantilevers bent up with different curvatures. For DLC film of 100 nm thick, the cantilever even formed microtubes. The relationship between the bimorph beam bending and DLC film properties (such as stress, modulus, etc.) were discussed in details

A Method to Extract the Intrinsic Mechanical Properties of Soft Metallic Thin Films Based on Nanoindentation Continuous Stiffness Measurement Technique

International Nuclear Information System (INIS)

Zhou, X Y; Jiang, Z D; Wang, H R; Zhu, Q

2006-01-01

In order to determine accurately the intrinsic hardness of the soft metallic thin film on a hard substrate using nanoindentation, a proper methodology irrespective of several important effects the Oliver-Pharr method concerns is described. First, the original analysis data such as the load, P, and contact stiffness, S, as a function of the indentation depth, h, are acquired by means of the continuous stiffness measurement (CSM) technique. By CSM, the complicating effects including indentation creep behaviour of metal materials as well as thermal drift on the measured results are avoided effectively. Then, the hardness of film-only is calculated via a material characteristic parameter, P/S 2 , which is independent of the contact area, A, based on the constant modulus assumption method. In this way, the influences of the substrate contribution and material pile-up behaviour needn't be accounted for. Guided by above ideas, moreover, a 504 nm Au film on the glass substrate system was chosen to study. The results show that the hardness of Au thin film is 1.6±1 GPa, which agree well with the literature. While the composite hardness measured by Oliver-Pharr method is between 2∼3GPa, obviously, which is overestimated. This implies the present methodology is a more accurate and simple way for extracting the true hardness of the soft metallic thin films

Enhancement of as-sputtered silver-tantalum oxide thin film coating on biomaterial stainless steel by surface thermal treatment

Science.gov (United States)

Alias, Rodianah; Mahmoodian, Reza; Shukor, Mohd Hamdi Abd; Yew, Been Seok; Muhamad, Martini

2018-04-01

Stainless steel 316L (SS316L) is extensively used as surgical/clinical tools due to its low carbon content and excellent mechanical characteristic. The fabrication of metal ceramic based on this metallic biomaterial favor its biofunctionality properties. However, instability phase of amorphous thin film lead to degradation, corrosion and oxidation. Thus, thin film coating requires elevated adhesion strength and higher surface hardness to meet clinical tools criteria. In this study, the SS316L was deposited with micron thickness of Ag-TaO thin film by using magnetron sputtering. The microstructure, elemental analysis and phase identification of Ag-TaO thin film were characterized by using FESEM, EDX and XRD, respectively; whereas the micro scratch test and micro hardness test were performed by using Micro Scratch Testing System and Vickers Micro Hardness Tester, respectively. It was found that the coating thin film's adhesion and hardness strength were improved from 672 to 2749 mN and 142 to 158 Hv respectively. It was found that the as-deposited surface were treated at 500 °C of temperatures with 2 °C/min ramping rate enhance 4.1 times of the adhesion strength value. Furthermore, FESEM characterization revealed coarsening structure of the thin film coating which can provide high durability service.

Nanoscale strengthening mechanisms in metallic thin film systems

Science.gov (United States)

Schoeppner, Rachel Lynn

Nano-scale strengthening mechanisms for thin films were investigated for systems governed by two different strengthening techniques: nano-laminate strengthening and oxide dispersion strengthening. Films were tested under elevated temperature conditions to investigate changes in deformation mechanisms at different operating temperatures, and the structural stability. Both systems exhibit remarkable stability after annealing and thus long-term reliability. Nano-scale metallic multilayers with smaller layer thicknesses show a greater relative resistance to decreasing strength at higher temperature testing conditions than those with larger layer thicknesses. This is seen in both Cu/Ni/Nb multilayers as well as a similar tri-component bi-layer system (Cu-Ni/Nb), which removed the coherent interface from the film. Both nanoindentation and micro-pillar compression tests investigated the strain-hardening ability of these two systems to determine what role the coherent interface plays in this mechanism. Tri-layer films showed a higher strain-hardening ability as the layer thickness decreased and a higher strain-hardening exponent than the bi-layer system: verifying the presence of a coherent interface increases the strain-hardening ability of these multilayer systems. Both systems exhibited hardening of the room temperature strength after annealing, suggesting a change in microstructure has occurred, unlike that seen in other multilayer systems. Oxide dispersion strengthened Au films showed a marked increase in hardness and wear resistance with the addition of ZnO particles. The threshold for stress-induced grain-refinement as opposed to grain growth is seen at concentrations of at least 0.5 vol%. These systems exhibited stable microstructures during thermal cycling in films containing at least 1.0%ZnO. Nanoindentation experiments show the drop in hardness following annealing is almost completely attributed to the resulting grain growth. Four-point probe resistivity

Ultra-hard AlMgB14 coatings fabricated by RF magnetron sputtering from a stoichiometric target

Science.gov (United States)

Grishin, A. M.; Khartsev, S. I.; Böhlmark, J.; Ahlgren, M.

2015-01-01

For the first time hard aluminum magnesium boride films were fabricated by RF magnetron sputtering from a single stoichiometric ceramic AlMgB14 target. Optimized processing conditions (substrate temperature, target sputtering power and target-to-substrate distance) enable fabrication of stoichiometric in-depth compositionally homogeneous films with the peak values of nanohardness 88 GPa and Young's modulus 517 GPa at the penetration depth of 26 nm and, respectively, 35 and 275 GPa at 200 nm depth in 2 μm thick film.

Characterization of diamond-like nanocomposite thin films grown by plasma enhanced chemical vapor deposition

Energy Technology Data Exchange (ETDEWEB)

Santra, T S; Liu, C H [Institute of Nanoengineering and Microsystems (NEMS), National Tsing Hua University, Hsinchu, Taiwan 30043 (China); Bhattacharyya, T K [Department of Electronics and Electrical Communication Engineering, Indian Institute of Technology, Kharagpur 721302, West Bengal (India); Patel, P [Department of Electrical and Computer Engineering, University of Illinois at Urbana Champaign, Urbana, Illinois 61801 (United States); Barik, T K [School of Applied Sciences, Haldia Institute of Technology, Haldia 721657, Purba Medinipur, West Bengal (India)

2010-06-15

Diamond-like nanocomposite (DLN) thin films, comprising the networks of a-C:H and a-Si:O were deposited on pyrex glass or silicon substrate using gas precursors (e.g., hexamethyldisilane, hexamethyldisiloxane, hexamethyldisilazane, or their different combinations) mixed with argon gas, by plasma enhanced chemical vapor deposition technique. Surface morphology of DLN films was analyzed by atomic force microscopy. High-resolution transmission electron microscopic result shows that the films contain nanoparticles within the amorphous structure. Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and x-ray photoelectron spectroscopy (XPS) were used to determine the structural change within the DLN films. The hardness and friction coefficient of the films were measured by nanoindentation and scratch test techniques, respectively. FTIR and XPS studies show the presence of C-C, C-H, Si-C, and Si-H bonds in the a-C:H and a-Si:O networks. Using Raman spectroscopy, we also found that the hardness of the DLN films varies with the intensity ratio I{sub D}/I{sub G}. Finally, we observed that the DLN films has a better performance compared to DLC, when it comes to properties like high hardness, high modulus of elasticity, low surface roughness and low friction coefficient. These characteristics are the critical components in microelectromechanical systems (MEMS) and emerging nanoelectromechanical systems (NEMS).

Tribological properties of coating films for core structure of HTGR

International Nuclear Information System (INIS)

Ozawa, Kenji; Kikuchi, Akiyoshi; Kawakami, Haruo

1985-01-01

The tribological properties of the various coating films used for the in-core structures of a high temperature gas-cooled experimental reactor were examined. When the explosion sprayed films of chrome carbide were applied for preventing galling in core restraining mechanism, the hardness of substrate materials exerted influence on the strength of the coating films. Also the effect of the surface roughness of the plasma sprayed films of zirconia on the sliding characteristics of the zirconia films and PGX graphite used for support plates was clarified. The coefficient of friction and the dependence of the amount of wear on surface pressure of these materials were examined. These results have been effectively utilized for the design of the test bodies of HENDEL-T2. In helium atmosphere, oxide film is hard to be formed on metal surface, especially on the contact surface of metals exposed to high temperature, there is the possibility to cause adhesion due to mutual diffusion and galling in sliding. As the means to prevent those, ceramic coating has been attempted. Sliding test, high pressure joining test, thermal cycle test and corrosion test in helium were carried out to evaluate the properties. (Koko, I.)

Hard and transparent films formed by nanocellulose-TiO2 nanoparticle hybrids.

Directory of Open Access Journals (Sweden)

Christina Schütz

Full Text Available The formation of hybrids of nanofibrillated cellulose and titania nanoparticles in aqueous media has been studied. Their transparency and mechanical behavior have been assessed by spectrophotometry and nanoindentation. The results show that limiting the titania nanoparticle concentration below 16 vol% yields homogeneous hybrids with a very high Young's modulus and hardness, of up to 44 GPa and 3.4 GPa, respectively, and an optical transmittance above 80%. Electron microscopy shows that higher nanoparticle contents result in agglomeration and an inhomogeneous hybrid nanostructure with a concomitant reduction of hardness and optical transmittance. Infrared spectroscopy suggests that the nanostructure of the hybrids is controlled by electrostatic adsorption of the titania nanoparticles on the negatively charged nanocellulose surfaces.

Hard and Transparent Films Formed by Nanocellulose–TiO2 Nanoparticle Hybrids

Science.gov (United States)

Schütz, Christina; Sort, Jordi; Bacsik, Zoltán; Oliynyk, Vitaliy; Pellicer, Eva; Fall, Andreas; Wågberg, Lars; Berglund, Lars; Bergström, Lennart; Salazar-Alvarez, German

2012-01-01

The formation of hybrids of nanofibrillated cellulose and titania nanoparticles in aqueous media has been studied. Their transparency and mechanical behavior have been assessed by spectrophotometry and nanoindentation. The results show that limiting the titania nanoparticle concentration below 16 vol% yields homogeneous hybrids with a very high Young’s modulus and hardness, of up to 44 GPa and 3.4 GPa, respectively, and an optical transmittance above 80%. Electron microscopy shows that higher nanoparticle contents result in agglomeration and an inhomogeneous hybrid nanostructure with a concomitant reduction of hardness and optical transmittance. Infrared spectroscopy suggests that the nanostructure of the hybrids is controlled by electrostatic adsorption of the titania nanoparticles on the negatively charged nanocellulose surfaces. PMID:23049689

Investigation of Fe-Si-N films as magnetic overcoat for high density recording disk drives

International Nuclear Information System (INIS)

Gauvin, M.; Talke, F. E.; Fullerton, E. E.

2010-01-01

A 50-nm-thick Fe-Si-N films were deposited via reactive magnetron cosputtering of independent Fe and Si targets, in Ar/N 2 gas mixture, under different dc Fe target power conditions. Magnetic properties, mechanical hardness and tribological properties were characterized as a function of the Fe target power by magnetometry, nanoindentation, and nanoscratch testing, respectively. Deposited samples were found to be ferromagnetic with a coercivity of approximately 20 Oe and a saturation magnetization increasing from 200 to 1100 emu/cm 3 as a function of Fe sputter power, i.e., values typical of soft magnetic materials. The mechanical hardness was found to be between 50% and 70% of the hardness of a pure SiN x film. Nanotribological properties of films deposited with a Fe target power ≥80 W degraded rapidly.

Adherence and scratching resistance of nanometric titania films

International Nuclear Information System (INIS)

Pascoali, S.; Dominguini, L.; Borges, J.B.

2012-01-01

TiO 2 films has been used to extend the wear resistance in bearing, seals for pumps and bone prostheses. In this study was analyzed the conventional hardness and scratch toughness. The scratching test equipment used was developed at the Laboratory of materials Labmat / UFSC. The tests were performed on Titania films deposited on glass plates and ceramics via reactive DC magnetron sputtering. The films were deposited by 10, 15 and 60 min. One of the samples has a titanium metal film of a few nanometers thick between the substrate and the Titania film, the oxide has been deposited for 30 min. At this rang of tests loads the deposited films show good adhesion to substrate, there was no cracking or spalling of the film. (author)

Nitrogen implantation of Ti and Ti+Al films deposited on tool steel

International Nuclear Information System (INIS)

Huang, C.-T.; Duh, J.-G.

1995-01-01

Titanium and aluminum thin films were deposited onto A2 steel by rf magnetron sputtering with various Al contents. The coated assembly was then implanted with nitrogen ions at 92 kV and 1 mA for 4.5 h. The thickness of the implanted Ti and Ti+Al films deposited for 1 h was around 0.4-0.5 μm. With the aid of X-ray diffraction by the grazing-incidence technique, secondary ion mass spectrum (SIMS) and X-ray photoelectron spectroscopy (XPS), the titanium oxide and titanium nitride were identified on the top and inner surface in the implanted Ti film. For Ti+Al films after nitrogen implantation, Ti 3 O 5 was formed on the top surface beneath which is a (Ti, Al) N solid solution. There was Ti 2 N compound formed in the implanted Ti film, while only a minor amount of Ti 2 N phase was observed in the inner region in the implanted Ti+Al film. The nitrogen distribution was flattened and spread in the implanted Ti film, while a concentration gradient was observed in the Ti+Al film after implantation. The measured surface hardness of implanted Ti film was higher than those of Ti+Al films and the hardness of implanted Ti+39%Al film was enhanced as compared to the Ti+50%Al film. (Author)

Nanostructured thin film coatings with different strengthening effects

Directory of Open Access Journals (Sweden)

Panfilov Yury

2017-01-01

Full Text Available A number of articles on strengthening thin film coatings were analyzed and a lot of unusual strengthening effects, such as super high hardness and plasticity simultaneously, ultra low friction coefficient, high wear-resistance, curve rigidity increasing of drills with small diameter, associated with process formation of nanostructured coatings by the different thin film deposition methods were detected. Vacuum coater with RF magnetron sputtering system and ion-beam source and arc evaporator for nanostructured thin film coating manufacture are represented. Diamond Like Carbon and MoS2 thin film coatings, Ti, Al, Nb, Cr, nitride, carbide, and carbo-nitride thin film materials are described as strengthening coatings.

Metal-doped diamond-like carbon films synthesized by filter-arc deposition

International Nuclear Information System (INIS)

Weng, K.-W.; Chen, Y.-C.; Lin, T.-N.; Wang, D.-Y.

2006-01-01

Diamond-like carbon (DLC) thin films are extensively utilized in the semiconductor, electric and cutting machine industries owing to their high hardness, high elastic modulus, low friction coefficients and high chemical stability. DLC films are prepared by ion beam-assisted deposition (BAD), sputter deposition, plasma-enhanced chemical vapor deposition (PECVD), cathodic arc evaporation (CAE), and filter arc deposition (FAD). The major drawbacks of these methods are the degraded hardness associated with the low sp 3 /sp 2 bonding ratio, the rough surface and poor adhesion caused by the presence of particles. In this study, a self-developed filter arc deposition (FAD) system was employed to prepare metal-containing DLC films with a low particle density. The relationships between the DLC film properties, such as film structure, surface morphology and mechanical behavior, with variation of substrate bias and target current, are examined. Experimental results demonstrate that FAD-DLC films have a lower ratio, suggesting that FAD-DLC films have a greater sp 3 bonding than the CAE-DLC films. FAD-DLC films also exhibit a low friction coefficient of 0.14 and half of the number of surface particles as in the CAE-DLC films. Introducing a CrN interfacial layer between the substrate and the DLC films enables the magnetic field strength of the filter to be controlled to improve the adhesion and effectively eliminate the contaminating particles. Accordingly, the FAD system improves the tribological properties of the DLC films

Recent developments in hard magnetic materials

International Nuclear Information System (INIS)

Asti, G.

1989-01-01

Hard magnetic materials find ever-increasing uses in modern technology. Their importance is mainly in the domain of permanent magnets, but a variety of other applications is being offered to this class of materials, especially for what regards the areas of information storage, telecommunications and special electronic devices. These developments are connected to the emphasis that is more and more given to thin films having high magnetic anisotropy. The recent advancement in the field of hard magnetic materials is among the best examples where technology depends to a great extent upon the continuous progress in the scientific knowledge. The research activity is characterized by the introduction of new classes of materials and continuous improvements in the preparation techniques both for what regards industrial processing and method for obtaining high quality materials in form of crystals, films or amorphous specimens. In this respect a special place must be reserved to rare earth transition metal compounds, a class of materials that attracted enormeous attention after the discovery by Hoffer and Strnat in 1966 of the large uniaxial magnetocrystalline anisotropy of the compound YCo 5 . Beside the so called 1:5 phase, other compositions of technical importance are the 2:17 and the recently discovered Nd 2 Fe 14 B, which is a real new ternary phase having tetragonal crystal structure. Great efforts have been done to gain a better understanding of the magnetic anisotropy and its relationship to the coercivity is of leading importance for a further development in this important area of magnetism. (orig.)

Utility of tantalum (Ta) coating to improve surface hardness in vitro bioactivity and biocompatibility of Co–Cr

Energy Technology Data Exchange (ETDEWEB)

Pham, Vuong-Hung [WCU Hybrid Materials Program, Department of Materials Science and Engineering, Seoul National University, Seoul, 151-742 (Korea, Republic of); Advanced Institute for Science and Technology (AIST), Hanoi University of Science and Technology (HUST), No 1, Dai Co Viet Road, Ha Noi (Viet Nam); Lee, Seung-Hee; Li, Yuanlong; Kim, Hyoun-Ee [WCU Hybrid Materials Program, Department of Materials Science and Engineering, Seoul National University, Seoul, 151-742 (Korea, Republic of); Shin, Kwan-Ha [Department of Dental Laboratory Science and Engineering, Korea University, Seoul, 136-703 (Korea, Republic of); Koh, Young-Hag, E-mail: kohyh@korea.ac.kr [Department of Dental Laboratory Science and Engineering, Korea University, Seoul, 136-703 (Korea, Republic of)

2013-06-01

This study reports the utility of tantalum (Ta) coating for improving the surface hardness, in vitro bioactivity and biocompatibility of Co–Cr implants. The use of direct current sputtering allowed for the deposition of a dense and uniform Ta film onto a Co–Cr substrate, which was composed of β-phase Ta grains. This hard Ta coating significantly improved the surface hardness of the Co–Cr by a factor of > 2.3. In addition, the Ta-deposited Co–Cr substrate showed a vigorous precipitation of apatite crystals on its surface after 4 weeks of immersion in simulated body fluid, suggesting its excellent in vitro bioactivity. This bioactive Ta coating led to a considerable improvement in the in vitro biocompatibility of the Co–Cr, which was assessed in terms of the attachment, proliferation and differentiation of pre-osteoblasts (MC3T3-E1). - Highlights: • Dense and uniform Ta film was deposited onto a Co–Cr substrate using DC sputtering. • The Ta coating significantly enhanced the surface hardness of the Co–Cr. • The in vitro biocompatibility of the Co–Cr was also significantly improved.

Utility of tantalum (Ta) coating to improve surface hardness in vitro bioactivity and biocompatibility of Co–Cr

International Nuclear Information System (INIS)

Pham, Vuong-Hung; Lee, Seung-Hee; Li, Yuanlong; Kim, Hyoun-Ee; Shin, Kwan-Ha; Koh, Young-Hag

2013-01-01

This study reports the utility of tantalum (Ta) coating for improving the surface hardness, in vitro bioactivity and biocompatibility of Co–Cr implants. The use of direct current sputtering allowed for the deposition of a dense and uniform Ta film onto a Co–Cr substrate, which was composed of β-phase Ta grains. This hard Ta coating significantly improved the surface hardness of the Co–Cr by a factor of > 2.3. In addition, the Ta-deposited Co–Cr substrate showed a vigorous precipitation of apatite crystals on its surface after 4 weeks of immersion in simulated body fluid, suggesting its excellent in vitro bioactivity. This bioactive Ta coating led to a considerable improvement in the in vitro biocompatibility of the Co–Cr, which was assessed in terms of the attachment, proliferation and differentiation of pre-osteoblasts (MC3T3-E1). - Highlights: • Dense and uniform Ta film was deposited onto a Co–Cr substrate using DC sputtering. • The Ta coating significantly enhanced the surface hardness of the Co–Cr. • The in vitro biocompatibility of the Co–Cr was also significantly improved

Adhesion of rhodium films on metallic substrates

International Nuclear Information System (INIS)

Marot, L.; Covarel, G.; Tuilier, M.-H.; Steiner, R.; Oelhafen, P.

2008-01-01

Rhodium coated metallic films were prepared by magnetron sputtering on metallic substrates. All films were elaborated in same conditions on copper, molybdenum and stainless steel. Adhesion strength tests were carried out by scratch test. The results reveal that the adhesion strength between the film and the substrate is influenced by the hardness of the substrate. Increase of deposition temperature improves the adhesion of the coating. In addition, pre-treatment of substrates by a filtered cathodic vacuum arc and the layer thickness have has some effects on the final adhesion strength

Adhesion of rhodium films on metallic substrates

Energy Technology Data Exchange (ETDEWEB)

Marot, L. [Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel (Switzerland)], E-mail: laurent.marot@unibas.ch; Covarel, G.; Tuilier, M.-H. [Laboratoire Mecanique, Materiaux et Procedes de Fabrication, Pole STIC-SPI-Math 61 rue Albert Camus, Universite de Haute-Alsace, F-68093 - Mulhouse Cedex (France); Steiner, R.; Oelhafen, P. [Department of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel (Switzerland)

2008-09-01

Rhodium coated metallic films were prepared by magnetron sputtering on metallic substrates. All films were elaborated in same conditions on copper, molybdenum and stainless steel. Adhesion strength tests were carried out by scratch test. The results reveal that the adhesion strength between the film and the substrate is influenced by the hardness of the substrate. Increase of deposition temperature improves the adhesion of the coating. In addition, pre-treatment of substrates by a filtered cathodic vacuum arc and the layer thickness have has some effects on the final adhesion strength.

Effect of plasma nitriding time on surface properties of hard chromium electroplated AISI 1010 steel

Energy Technology Data Exchange (ETDEWEB)

Kocabas, Mustafa [Yildiz Technical Univ., Istanbul (Turkey). Metallurgical and Materials Engineering Dept.; Danisman, Murat [Gedik Univ., Istanbul (Turkey). Electrical and Electronic Engineering Dept.; Cansever, Nurhan [Yildiz Technical Univ., Istanbul (Turkey); Uelker, Suekrue [Afyon Kocatepe Univ. (Turkey). Dept. of Mechanical Engineering

2015-06-01

Properties of steel can be enhanced by surface treatments such as coating. In some cases, further treatments such as nitriding can also be used in order to get even better results. In order to investigate the properties of nitride layer on hard Cr coated AISI 1010 steel, substrates were electroplated to form hard Cr coatings. Then hard Cr coatings were plasma nitrided at 700 C for 3 h, 5 h and 7 h and nitride phases on the coatings were investigated by X-ray diffraction analysis. The layer thickness and surface properties of nitride films were investigated by scanning electron microscopy. The hardness and adhesion properties of Cr-N phases were examined using nano indentation and Daimler-Benz Rockwell C adhesion tests. The highest measured hardness was 24.1 GPa and all the three samples exhibited poor adhesion.

Effect of plasma nitriding time on surface properties of hard chromium electroplated AISI 1010 steel

International Nuclear Information System (INIS)

Kocabas, Mustafa; Uelker, Suekrue

2015-01-01

Properties of steel can be enhanced by surface treatments such as coating. In some cases, further treatments such as nitriding can also be used in order to get even better results. In order to investigate the properties of nitride layer on hard Cr coated AISI 1010 steel, substrates were electroplated to form hard Cr coatings. Then hard Cr coatings were plasma nitrided at 700 C for 3 h, 5 h and 7 h and nitride phases on the coatings were investigated by X-ray diffraction analysis. The layer thickness and surface properties of nitride films were investigated by scanning electron microscopy. The hardness and adhesion properties of Cr-N phases were examined using nano indentation and Daimler-Benz Rockwell C adhesion tests. The highest measured hardness was 24.1 GPa and all the three samples exhibited poor adhesion.

The effect of substrate bias on titanium carbide/amorphous carbon nanocomposite films deposited by filtered cathodic vacuum arc

International Nuclear Information System (INIS)

Zhang, Xu; Liang, Hong; Wu, Zhenglong; Wu, Xiangying; Zhang, Huixing

2013-01-01

The titanium carbide/amorphous carbon nanocomposite films have been deposited on silicon substrate by filtered cathodic vacuum arc (FCVA) technology, the effects of substrate bias on composition, structures and mechanical properties of the films are studied by scanning electron spectroscopy, X-ray diffraction and X-ray photoelectron spectroscopy and nano-indentation. The results show that the Ti content, deposition rate and hardness at first increase and then decrease with increasing the substrate bias. Maximum hardness of the titanium carbide/amorphous carbon nanocomposite film is 51 Gpa prepared at −400 V. The hardness enhancement may be attributed to the compressive stress and the fraction of crystalline TiC phase due to ion bombardment

Structure and mechanical properties of silica doped zirconia thin films

Energy Technology Data Exchange (ETDEWEB)

Uhlmann, Ina, E-mail: uhlmann@ceramics.tu-darmstadt.de [Institute of Materials Science, Technische Universität Darmstadt, 64287 Darmstadt (Germany); Hawelka, Dominik [Fraunhofer Institute for Laser Technology ILT, 52074 Aachen (Germany); Hildebrandt, Erwin [Institute of Materials Science, Technische Universität Darmstadt, 64287 Darmstadt (Germany); Pradella, Jens [Merck KGaA Darmstadt, 64293 Darmstadt (Germany); Rödel, Jürgen [Institute of Materials Science, Technische Universität Darmstadt, 64287 Darmstadt (Germany)

2013-01-01

Sol–gel based wear resistant coatings are presented as an alternative to existing vapor deposition coatings. The films consist of zirconia which has been doped with 8 wt.% silica. Crack-free single as well as multilayer coatings with thicknesses of 80 and 150 nm, respectively, could be produced after sintering at 1000 °C. The evolution of layer thickness, optical, chemical and mechanical properties during film annealing was investigated by ellipsometry, scanning electron microscopy, thermal gravimetric analysis, Fourier transform infrared spectroscopy, X-ray diffraction, nanoindentation and micro-abrasion. Micro-abrasion has been established as an easy and powerful tool to achieve first comparative abrasion data which could be correlated to hardness, Young's modulus and structure of the films. Above 600 °C a tetragonal, oxide coating with a Young's modulus ranging from 80 to 90 GPa, a hardness from 7 to 8 GPa and an increased abrasion resistance was obtained. The film density reached 4.64 g/cm{sup 3} with the mean refractive index n{sub 550} {sub nm} lying between 1.88 and 1.93. - Highlights: ► Sol–gel zirconia–8 wt.% silica coatings with hardness up to 8 GPa achieved ► Layer thickness as compared by ellipsometry and scanning electron microscopy ► Crack-free multilayer coatings produced up to 150 nm.

The electroplated Pd–Co alloy film on 316 L stainless steel and the corrosion resistance in boiling acetic acid and formic acid mixture with stirring

Energy Technology Data Exchange (ETDEWEB)

Li, Sirui; Zuo, Yu, E-mail: zuoy@mail.buct.edu.cn; Tang, Yuming; Zhao, Xuhui

2014-12-01

Highlights: • Pd–Co alloy films were deposited on 316 L stainless steel by electroplating. • The Pd–Co films show fine grain size, low porosity and obviously high hardness. • In strong acids with Br{sup −} and stirring, Pd–Co films show good corrosion resistance. • The high hardness of Pd–Co film retards the development of micro-pores in the film. - Abstract: Pd–Co alloy films were deposited on 316 L stainless steel by electroplating. Scanning electronic microscopy, X-ray photoelectron spectroscopy, X-ray diffraction, weight loss test and polarization test were used to determine the properties of the Pd–Co alloy films. The Pd–Co films show fine grain size, low porosity and obviously high micro-hardness. The Co content in the film can be controlled in a large range from 21.9 at.% to 57.42 at.%. Pd is rich on the Pd–Co film surface, which is benefit to increase the corrosion resistance. In boiling 90% acetic acid plus 10% formic acid mixture with 0.005 M Br{sup −} under stirring, the Pd–Co plated stainless steel samples exhibit evidently better corrosion resistance in contrast to Pd plated samples. The good corrosion resistance of the Pd–Co alloy film is explained by the better compactness, the lower porosity, and the obviously higher micro-hardness of the alloy films, which increases the resistance to erosion and retards the development of micro-pores in the film.

Reliability assessment of ultra-thin HfO{sub 2} films deposited on silicon wafer

Energy Technology Data Exchange (ETDEWEB)

Fu, Wei-En [Center for Measurement Standards, Industrial Technology Research Institute, Room 216, Building 8, 321 Kuang Fu Road Sec. 2, Hsinchu, Taiwan (China); Chang, Chia-Wei [Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan (China); Chang, Yong-Qing [Center for Measurement Standards, Industrial Technology Research Institute, Room 216, Building 8, 321 Kuang Fu Road Sec. 2, Hsinchu, Taiwan (China); Yao, Chih-Kai [Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan (China); Liao, Jiunn-Der, E-mail: jdliao@mail.ncku.edu.tw [Department of Materials Science and Engineering, National Cheng Kung University, 1 University Road, Tainan 70101, Taiwan (China)

2012-09-01

Highlights: Black-Right-Pointing-Pointer Nano-mechanical properties on annealed ultra-thin HfO{sub 2} film are studied. Black-Right-Pointing-Pointer By AFM analysis, hardness of the crystallized HfO{sub 2} film significantly increases. Black-Right-Pointing-Pointer By nano-indention, the film hardness increases with less contact stiffness. Black-Right-Pointing-Pointer Quality assessment on the annealed ultra-thin films can thus be achieved. - Abstract: Ultra-thin hafnium dioxide (HfO{sub 2}) is used to replace silicon dioxide to meet the required transistor feature size in advanced semiconductor industry. The process integration compatibility and long-term reliability for the transistors depend on the mechanical performance of ultra-thin HfO{sub 2} films. The criteria of reliability including wear resistance, thermal fatigue, and stress-driven failure rely on film adhesion significantly. The adhesion and variations in mechanical properties induced by thermal annealing of the ultra-thin HfO{sub 2} films deposited on silicon wafers (HfO{sub 2}/SiO{sub 2}/Si) are not fully understood. In this work, the mechanical properties of an atomic layer deposited HfO{sub 2} (nominal thickness Almost-Equal-To 10 nm) on a silicon wafer were characterized by the diamond-coated tip of an atomic force microscope and compared with those of annealed samples. The results indicate that the annealing process leads to the formation of crystallized HfO{sub 2} phases for the atomic layer deposited HfO{sub 2}. The HfSi{sub x}O{sub y} complex formed at the interface between HfO{sub 2} and SiO{sub 2}/Si, where the thermal diffusion of Hf, Si, and O atoms occurred. The annealing process increases the surface hardness of crystallized HfO{sub 2} film and therefore the resistance to nano-scratches. In addition, the annealing process significantly decreases the harmonic contact stiffness (or thereafter eliminate the stress at the interface) and increases the nano-hardness, as measured by vertically

Production, Characterization And Tribological Properties Of Molybdenum Doped Diamond-like Carbon Films

OpenAIRE

Alp, Emre

2012-01-01

Thin films whose thickness is typically less than several microns are produced by the deposition of individual atoms on any substrate. Historically, thin films have been used for about half a century in producing instrument hard coatings, optical coatings, thin-film batteries, electronic devices, photovoltaic devices, memory devices and decorative parts. Thin film technology is still being developed by a technological advancement since it is a key factor in the twenty-first century developmen...

Microindentation hardness testing of coatings: techniques and interpretation of data

Science.gov (United States)

Blau, P. J.

1986-09-01

This paper addresses the problems and promises of micro-indentation testing of thin solid films. It has discussed basic penetration hardness testing philosophy, the peculiarities of low load-shallow penetration tests of uncoated metals, and it has compared coated with uncoated behavior so that some of the unique responses of coatings can be distinguished from typical hardness versus load behavior. As the uses of thin solid coatings with technological interest continue to proliferate, microindentation testing methodology will increasingly be challenged to provide useful tools for their characterization. The understanding of microindentation response must go hand-in-hand with machine design so that the capability of measurement precision does not outstrip our abilities to interpret test results in a meaningful way.

On the properties of nanocomposite amorphous carbon films prepared by off-plane double bend filtered cathodic vacuum arc

International Nuclear Information System (INIS)

Tay, B.K.; Zhang, P.

2002-01-01

It is known to deposit hard thin films, such as tetrahedral amorphous carbon (ta-C), using a filtered cathode vacuum arc (FCVA). These ta-C films have interesting and useful properties because of the high sp 3 fraction of carbon atoms (up to 87%) in the film. However, the high internal stress in the films can limit their applications as the film may flake away from the substrate. In order to reduce the internal stress of the ta-C films and in an attempt to improve adhesion of thick films of this type, growth modifications such as incorporating metal into the ta-C films have been carried out. Nanocomposite amorphous carbon films were deposited by FCVA technique using metal-carbon composite target. Atomic force microscopy, Raman, and X-ray photoelectron spectroscopy were used to characterize the morphology and structure of the films. Nanoindenter and surface profilometer were used to determine the hardness, Young's modulus, and internal stress. The same metal composition targets for different elements results in different metal composition in the corresponding nanocomposite amorphous carbon films. We attribute this observation to the dynamic balance deposition effect of the FCVA deposition process. The influence of the type of metallic elements and its composition in the films on the structural, mechanical properties, surface energy and field emission (FE) performance was studied. The incorporation of metal into the films results in the decrease of sp 3 fraction, internal stress in the films, but the hardness and Young's modulus remains at high level. The surface energy of the films increases with incorporating Ni atoms, but decreases after incorporating Fe and Al atoms into the films. After heat-treatment, the incorporation of metal into ta-C films can greatly improve the FE performance

Evaluation of workers exposed to dust containing hard metals and aluminum oxide.

Science.gov (United States)

Schwarz, Y; Kivity, S; Fischbein, A; Abraham, J L; Fireman, E; Moshe, S; Dannon, Y; Topilsky, M; Greif, J

1998-08-01

Fourteen worker exposed to hard metals and aluminum oxide were evaluated. Six heavily exposed workers underwent bronchoscopy and bronchoalveolar lavage, and five workers underwent transbronchial biopsy. Microchemical analysis of transbronchial biopsies showed a high lung burden of exogenous particles, especially metal related to their hard metals exposure. Lung tissue and cellular changes, which were associated with exposure to hard metal and aluminum oxide, corresponded well with the microanalytic test results. Three workers had at biopsy diffuse interstitial inflammatory changes: two of them were asymptomatic with normal chest X-ray films, and one had clinically evident disease with severe giant cell inflammation. Two other workers showed focal inflammation. The worker showing clinical disease and one asymptomatic worker with interstitial inflammatory changes had evaluated bronchoalveolar lavage fluid-eosinophilia counts. These two were father (with clinical disease) and son (asymptomatic).

Evaluating elastic modulus and strength of hard coatings by relative method

International Nuclear Information System (INIS)

Bao, Y.W.; Zhou, Y.C.; Bu, X.X.; Qiu, Y.

2007-01-01

A simple approach named relative method is developed for determining the elastic modulus and strength of hard coatings. Analytical relationship among the moduli of the film, the substrate, and the film/substrate system was derived based on bending model, from which the elastic modulus of the coating can be determined uniquely via the measured moduli of the samples before and after coating. Furthermore, the relationship between the strength of the films and the bending strength of the coated sample is derived, thus both the modulus and the strength of coating can be evaluated via traditional tests on coated samples. Mathematic expressions of those calculations were derived, respectively for rectangular beam samples with three types of coating configurations: single face coating, sandwich coating and around coating. Experimental results using various brittle coatings demonstrated the validity and convenience of this method

Evaluating elastic modulus and strength of hard coatings by relative method

Energy Technology Data Exchange (ETDEWEB)

Bao, Y.W. [Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016 (China); China Building Materials Academy, Beijing 100024 (China)], E-mail: ywbao@imr.ac.cn; Zhou, Y.C. [Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016 (China); Bu, X.X. [China Building Materials Academy, Beijing 100024 (China); Qiu, Y. [China Building Materials Academy, Beijing 100024 (China)

2007-06-15

A simple approach named relative method is developed for determining the elastic modulus and strength of hard coatings. Analytical relationship among the moduli of the film, the substrate, and the film/substrate system was derived based on bending model, from which the elastic modulus of the coating can be determined uniquely via the measured moduli of the samples before and after coating. Furthermore, the relationship between the strength of the films and the bending strength of the coated sample is derived, thus both the modulus and the strength of coating can be evaluated via traditional tests on coated samples. Mathematic expressions of those calculations were derived, respectively for rectangular beam samples with three types of coating configurations: single face coating, sandwich coating and around coating. Experimental results using various brittle coatings demonstrated the validity and convenience of this method.

Influence of substrate bias on the structure and properties of (Ti, Al)N films deposited by filtered cathodic vacuum arc

International Nuclear Information System (INIS)

Cheng, Y.H.; Tay, B.K.; Lau, S.P.; Shi, X.

2001-01-01

(Ti, Al)N films were deposited by an off-plane, double-bend, filtered cathodic vacuum arc technique in N 2 atmosphere at room temperature. The (Ti, Al)N films deposited are atomically smooth. The influence of substrate negative bias at the wide range (0-1000 V) on the deposition rate, surface morphology, crystal structure, internal stress, and mechanical properties of (Ti, Al)N films were systematically studied. Increasing substrate bias results in the decrease of deposition rate and the increase of surface roughness monotonically. At the bias of 0 V, (Ti, Al)N films are amorphous, and the internal stress, hardness, and Young's modulus for the deposited films are fairly low. With increasing substrate bias to 200 V, single-phase face-centered cubic-type nanocrystalline (Ti, Al)N films can be obtained, and the internal stress, hardness, and Young's modulus increase to the maximum of 7 GPa, 28 GPa, and 240 GPa, respectively. Further increase of substrate bias results in the decrease of intensity and the broadening of x-ray diffraction lines, and the gradual decrease of internal stress, hardness, and Young's modulus in (Ti, Al)N films

Growth and surface characterization of TiNbZr thin films deposited by magnetron sputtering for biomedical applications

Energy Technology Data Exchange (ETDEWEB)

Tallarico, D.A. [Federal University of Sao Carlos, Materials Science and Engineering Graduation Program, Via Washington Luis km 235, CEP 13565-905 Sao Carlos, SP (Brazil); Gobbi, A.L. [Brazilian Nanotechnology National Laboratory, Rua Giuseppe Máximo Scolfaro 10.000, CEP 13083-100 Campinas, SP (Brazil); Paulin Filho, P.I. [Federal University of Sao Carlos, Department of Materials Engineering, Via Washington Luis km 235, CEP 13565-905 Sao Carlos, SP (Brazil); Maia da Costa, M.E.H. [Pontifical Catholic University of Rio de Janeiro, Department of Physics, CEP 22451-900 Rio de Janeiro, RJ (Brazil); Nascente, P.A.P., E-mail: nascente@ufscar.br [Federal University of Sao Carlos, Department of Materials Engineering, Via Washington Luis km 235, CEP 13565-905 Sao Carlos, SP (Brazil)

2014-10-01

Low modulus of elasticity and the presence of non-toxic elements are important criteria for the development of materials for implant applications. Low modulus Ti alloys can be developed by designing β-Ti alloys containing non-toxic alloying elements such as Nb and Zr. Actually, most of the metallic implants are produced with stainless steel (SS) because it has adequate bulk properties to be used as biomaterials for orthopedic or dental implants and is less expensive than Ti and its alloys, but it is less biocompatible than them. The coating of this SS implants with Ti alloy thin films may be one alternative to improve the biomaterial properties at a relatively low cost. Sputtering is a physical deposition technique that allows the formation of nanostructured thin films. Nanostructured surfaces are interesting when it comes to the bone/implant interface due to the fact that both the surface and the bone have nanoscale particle sizes and similar mechanical properties. TiNbZr thin films were deposited on both Si(111) and stainless steel (SS) substrates. The TiNbZr/Si(111) film was used as a model system, while the TiNbZr/SS film might improve the biocompatibility and extend the life time of stainless steel implants. The morphology, chemical composition, Young's modulus, and hardness of the films were analyzed by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDS), and nanoindentation. - Highlights: • TiNbZr thin films were deposited on Si(111) and stainless steel (SS). • Their Young's modulus differences are within 5.3% and hardness 1.7%. • TiNbZr/SS film chemical composition remained almost constant with depth. • TiNbZr films presented nanostructured grains and low roughness for substrates. • TiNbZr/SS film hardness was about 100% greater than the SS substrate hardness.

Growth and surface characterization of TiNbZr thin films deposited by magnetron sputtering for biomedical applications

International Nuclear Information System (INIS)

Tallarico, D.A.; Gobbi, A.L.; Paulin Filho, P.I.; Maia da Costa, M.E.H.; Nascente, P.A.P.

2014-01-01

Low modulus of elasticity and the presence of non-toxic elements are important criteria for the development of materials for implant applications. Low modulus Ti alloys can be developed by designing β-Ti alloys containing non-toxic alloying elements such as Nb and Zr. Actually, most of the metallic implants are produced with stainless steel (SS) because it has adequate bulk properties to be used as biomaterials for orthopedic or dental implants and is less expensive than Ti and its alloys, but it is less biocompatible than them. The coating of this SS implants with Ti alloy thin films may be one alternative to improve the biomaterial properties at a relatively low cost. Sputtering is a physical deposition technique that allows the formation of nanostructured thin films. Nanostructured surfaces are interesting when it comes to the bone/implant interface due to the fact that both the surface and the bone have nanoscale particle sizes and similar mechanical properties. TiNbZr thin films were deposited on both Si(111) and stainless steel (SS) substrates. The TiNbZr/Si(111) film was used as a model system, while the TiNbZr/SS film might improve the biocompatibility and extend the life time of stainless steel implants. The morphology, chemical composition, Young's modulus, and hardness of the films were analyzed by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDS), and nanoindentation. - Highlights: • TiNbZr thin films were deposited on Si(111) and stainless steel (SS). • Their Young's modulus differences are within 5.3% and hardness 1.7%. • TiNbZr/SS film chemical composition remained almost constant with depth. • TiNbZr films presented nanostructured grains and low roughness for substrates. • TiNbZr/SS film hardness was about 100% greater than the SS substrate hardness

Tribological properties of self-lubricating Ta-Cu films

Science.gov (United States)

Qin, Wen; Fu, Licai; Zhu, Jiajun; Yang, Wulin; Li, Deyi; Zhou, Lingping

2018-03-01

In this paper, Ta and TaCu films were deposited by using magnetron sputtering, and the tribological properties of the films against Si3N4 balls were investigated under the loads of 2 N and 5 N. The average grain sizes of both films are below 25 nm. Ta and TaCu films have approximate hardness. While the wear rate of TaCu film is much smaller than that of Ta film. Post-wear testing XRD, Raman and XPS revealed the formation of tantalum oxide on the worn surface of both Ta and TaCu films. Tantalum oxidation is effectively lubricating to reduce friction coefficient. So the friction coefficient of both Ta and TaCu film is about 0.45 under different applied loads. Meanwhile, the addition of Cu could increase the toughness of the film, and avoid the generation of wear debris, resulting in a significant increase in wear resistance.

Synthesis and characterization of boron incorporated diamond-like carbon thin films

International Nuclear Information System (INIS)

Zhang, L.L.; Yang, Q.; Tang, Y.; Yang, L.; Zhang, C.; Hu, Y.; Cui, X.

2015-01-01

Boron incorporated diamond-like carbon (B-DLC) (up to 8 wt.% boron) thin films were synthesized on silicon wafers using biased target ion beam deposition technique, where diamond-like carbon (DLC) was deposited by ion beam deposition and boron (B) was simultaneously incorporated by biased target sputtering of a boron carbide (B 4 C) target under different conditions. Pure DLC films and B–C films were also synthesized by ion beam deposition and biased target sputtering of B 4 C under similar conditions, respectively, as reference samples. The microstructure and mechanical properties of the synthesized films have been characterized by various technologies. It has been found that B exists in different states in B-DLC, including carbon-rich and B-rich boron carbides, boron suboxide and boron oxide, and the oxidation of B probably occurs during the film deposition. The incorporation of B into DLC leads to the increase of sp 3 bonded carbon in the films, the increase of both film hardness and elastic modulus, and the decrease of both surface roughness and friction coefficient. Furthermore, the content of sp 3 bonded carbon, film hardness and elastic modulus increase, and the film surface roughness and friction coefficient decrease with the increase of B-rich carbide in the B-DLC films. - Highlights: • Biased target ion beam deposition technique is promising to produce high quality DLC based thin films; • Boron exists in different states in B-DLC thin films; • The incorporation of B to DLC with different levels leads to improved film properties; • The fraction of sp 3 bonded C in B-DLC thin films increase with the increase of B-rich carbide content in the films

Mechanical characterization of YBCO thin films using nanoindentation and finite element method

Energy Technology Data Exchange (ETDEWEB)

Zhang, Weixing [The Ministry of Education of China (China). Key Lab. of Mechanics on Environment and Disaster in Western China; Lanzhou Univ. (China). College of Civil Engineering and Mechanics

2017-09-15

The mechanical properties of YBCO thin film deposited on SrTiO{sub 3} (100) substrates by magnetron sputtering were determined using Berkovich nanoindentation and scanning electron microscopy. Hardness and elastic modulus were determined via the Oliver-Pharr method from indentation load-depth curves. The hardness values of the YBCO thin film show depth dependence, i. e., indentation size effect, which arose from the surface roughness as detected by scanning electron microscopy. Multiple pop-in events were observed on the loading curves, however, no obvious pop-out takes place during the elastic recovery. In addition, an effective analytical method accommodating the indenter imperfection was proposed and validated against experimental data in terms of elastic modulus, yield stress and friction angle using the Drucker-Prager yield criterion for the YBCO thin film.

Practical chemical analysis of Pt and Pd based heterogeneous catalysts with hard X-ray photoelectron spectroscopy

Energy Technology Data Exchange (ETDEWEB)

Yoshikawa, H., E-mail: YOSHIKAWA.Hideki@nims.go.jp [National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047 (Japan); Matolínová, I.; Matolín, V. [Charles University in Prague, Faculty of Mathematics and Physics, V Holešovičkách 2, 18000 Prague 8 (Czech Republic)

2013-10-15

Highlights: •Hard X-ray photoelectron spectroscopy (HAXPES) enables interface analysis of catalyst. •HAXPES enables overall analysis of porous film of Pt-doped CeO{sub 2} and related catalyst. •HAXPES enables analysis of trace elements for Pd and Pt{sub 3}Ni nanoparticle catalysts. -- Abstract: Interfacial properties including configuration, porosity, chemical states, and atomic diffusion greatly affect the performance of supported heterogeneous catalysts. Hard X-ray photoelectron spectroscopy (HAXPES) can be used to analyze the interfaces of heterogeneous catalysts because of its large information depth of more than 20 nm. We use HAXPES to examine Pt-doped CeO{sub 2} and related thin film catalysts evaporated on Si, carbon, and carbon nanotube substrates, because Pt-doped CeO{sub 2} has great potential as a noble metal-based heterogeneous catalyst for fuel cells. The HAXPES measurements clarify that the dopant material, substrate material, and surface pretreatment of substrate are important parameters that affect the interfacial properties of Pt-doped CeO{sub 2} and related thin film catalysts. Another advantage of HAXPES measurement of heterogeneous catalysts is that it can be used for chemical analysis of trace elements by detecting photoelectrons from deep core levels, which have large photoionization cross-sections in the hard X-ray region. We use HAXPES for chemical analysis of trace elements in Pd nanoparticle catalysts immobilized on sulfur-terminated substrates and Pt{sub 3}Ni nanoparticle catalysts enveloped by dendrimer molecules.

The properties of nanocomposite aluminium-silicon based thin films deposited by filtered arc deposition

Energy Technology Data Exchange (ETDEWEB)

Bendavid, A.; Martin, P.J.; Takikawa, H

2002-12-02

Thin films of aluminium silicon oxynitride have been deposited on conducting (100) silicon wafers by filtered arc deposition (FAD) under nitrogen and/or oxygen gas flow. The influence of the N{sub 2}/O{sub 2} flow ratio on the crystal structure, optical and mechanical properties has been investigated. The results of X-ray diffraction showed that the film structure comprised of an AlN crystallite with amorphous Si{sub 3}N{sub 4} and SiO{sub x}. The optical properties over the range of 350-800 nm were measured using spectroscopic ellipsometry and found to be strongly dependent on N{sub 2}/O{sub 2} flow ratio. The refractive index values of the films were measured to be in the range of 2.2-1.64 at a wavelength of 670 nm for oxygen flow range of 0-100%. The hardness of the films was found to be strongly dependent on the oxygen content in the film. The hardness range of the films was between 10 and 22 GPa and for the stress between 0.3 and 1.2 GPa.

Microstructure and hardness evolution of nanochannel W films irradiated by helium at high temperature

Science.gov (United States)

Qin, Wenjing; Wang, Yongqiang; Tang, Ming; Ren, Feng; Fu, Qiang; Cai, Guangxu; Dong, Lan; Hu, Lulu; Wei, Guo; Jiang, Changzhong

2018-04-01

Plasma facing materials (PFMs) face one of the most serious challenges in fusion reactors, including unprecedented harsh environment such as 14.1 MeV neutron and transmutation gas irradiation at high temperature. Tungsten (W) is considered to be one of the most promising PFM, however, virtually insolubility of helium (He) in W causes new material issues such as He bubbles and W "fuzz" microstructure. In our previous studies, we presented a new strategy using nanochannel structure designed in the W film to increase the releasing of He atoms and thus to minimize the He nucleation and "fuzz" formation behavior. In this work, we report the further study on the diffusion of He atoms in the nanochannel W films irradiated at a high temperature of 600 °C. More specifically, the temperature influences on the formation and growth of He bubbles, the lattice swelling, and the mechanical properties of the nanochannel W films were investigated. Compared with the bulk W, the nanochannel W films possessed smaller bubble size and lower bubble areal density, indicating that noticeable amounts of He atoms have been released out along the nanochannels during the high temperature irradiations. Thus, with lower He concentration in the nanochannel W films, the formation of the bubble superlattice is delayed, which suppresses the lattice swelling and reduces hardening. These aspects indicate the nanochannel W films have better radiation resistance even at high temperature irradiations.

Mechanical properties of TiN films deposited by changed-pressure r.f. sputtering

International Nuclear Information System (INIS)

Kubo, Y.; Hashimoto, M.

1991-01-01

TiN was deposited onto glass, stainless steel and cemented carbide by r.f. magnetron sputtering. The mechanical properties of TiN such as hardness, internal stress and adhesion were assessed by the Vickers microhardness test, the bending method and the modified scratch test. It was found that the operating pressure during sputtering deposition strongly affects these mechanical properties. As the operating pressure is increased beyond 0.6-0.7 Pa, the adhesion of TiN films onto the substrate increases enormously, but the hardness decreases owing to the release of the high compressive stress in the film. Therefore changing the pressure from high to low during deposition could be a good way of optimizing both hardness and adhesion. The effectiveness of this changed-pressure process was experimentally verified by cutting tests using TiN-coated cemented carbide tools. This process will be applicable to any other hard coating materials having high compressive stresses. (orig.)

Surface properties of UV irradiated PC–TiO{sub 2} nanocomposite film

Energy Technology Data Exchange (ETDEWEB)

Jaleh, B., E-mail: bkjaleh@yahoo.com; Shahbazi, N.

2014-09-15

Highlights: • Production of PC–TiO{sub 2} nanocomposite films. • Fully characterization of PC–TiO{sub 2} nanocomposite films. • Influence of UV irradiation on surface properties and hardness of PC–TiO{sub 2} nanocomposite film. - Abstract: In this work, polycarbonate–TiO{sub 2} nanocomposite films were prepared with two different percentages. The structure of samples were studied by X-ray diffraction. Thermal stability of the nanocomposites was studied by thermogravimetric analysis (TGA). The polycarbonate and polycarbonate–TiO{sub 2} nanocomposite films were exposed by UV light at different irradiation times. The effects of UV irradiation on the surface properties of samples have been studied by different characterization techniques, viz. scanning electron microscopy (SEM), FTIR spectroscopy, X-ray photoelectron spectroscopy (XPS), contact angle measurement and Vickers microhardness tester. Hydrophilicity and surface energy of UV treated samples varied depending on UV irradiation time. TGA curves showed that nanocomposite films have higher resistance to thermal degradation compared to polycarbonate. XPS analysis shows that surface of samples become more oxidized due to UV irradiation. For nanocomposite film, the smallest contact angle was observed in association with the longest UV irradiation time. The contact angle significantly decreased from 90° to 12° after 15 h of UV irradiation. It is observed that the hardness of the nanocomposite films increases after UV irradiation.

Deposition and properties of Al-containing diamond-like carbon films by a hybrid ion beam sources

International Nuclear Information System (INIS)

Dai Wei; Wang Aiying

2011-01-01

Research highlights: → Weak carbide former, Al element, was incorporated into DLC films using a hybrid ion beams system comprising an anode-layer ion source and a magnetron sputtering unit. → The structure disorder of the films tended to decrease with Al atoms doping, which resulted in the distinct reduction of the film internal stress and hardness, but the internal stress dropped faster than the hardness. → The DLC films with low internal stress and high hardness can be acquired by Al incorporation. - Abstract: Metal incorporation is one of the most effective methods for relaxing internal stress in diamond-like carbon (DLC) films. It was reported that the chemical state of the incorporated metal atoms has a significant influence on the film internal stress. The doped atoms embedding in the DLC matrix without bonding with C atoms can reduce the structure disorder of the DLC films through bond angle distortion and thus relax the internal stress of the films. In present paper, Al atoms, which are inert to carbon, were incorporated into the DLC films deposited by a hybrid ion beams system comprising an anode-layer ion source and a magnetron sputtering unit. The film composition, microstructure and atomic bond structure were characterized using X-ray photoelectron spectroscopy, transmission electron microscopy and Raman spectroscopy. The internal stress, mechanical properties and tribogoical behavior were studied as a function of Al concentration using a stress-tester, nanoindentation and ball-on-disc tribo-tester, respectively. The results indicated that the incorporated Al atoms were dissolved in the DLC matrix without bonding with C atoms and the films exhibited the feature of amorphous carbon. The structure disorder of the films tended to decrease with Al atoms incorporation. This resulted in the distinct reduction of the internal stress in the films. All Al-DLC films exhibited a lower friction coefficient compared with pure DLC film. The formation of the

Oscillatory behavior of the magnetic properties of Nd–Fe–B films with Mo and Mo–Cu additions

International Nuclear Information System (INIS)

Urse, M.; Grigoras, M.; Lupu, N.; Borza, F.; Chiriac, H.

2013-01-01

A series of Ta/NdFeB/Ta thin films with Mo and Mo–Cu additions embedded by alloying and by stratification have been prepared by r.f. sputtering. The influence of additions, their embedding mode, and annealing temperature on the structural and magnetic behavior of Ta/NdFeB/Ta thin films is presented. The use of additions of Mo and Mo–Cu leads to refined grain structure and improvement in the hard magnetic characteristics of Ta/NdFeB/Ta thin films. The Ta/[NdFeBMo(540 nm)/Ta films and Ta/[NdFeB(180 nm)/MoCu(dnm)] × n/Ta multilayer films present enhanced coercivities and M r /M s ratios in comparison with the Ta/NdFeB(540 nm)/Ta films. The stratification of Ta/NdFeB/Ta thin films with Mo–Cu interlayers leads to an oscillatory behavior of hard magnetic characteristics of the Ta/[NdFeB(180 nm)/MoCu(dnm)] × n/Ta multilayer films, when the thickness, d, of Mo–Cu interlayers varies by increments of 1 nm. When the thickness of Mo–Cu interlayers varies by increments of 2 nm the oscillatory behavior of the magnetic characteristics is not revealed. For a thickness of the Mo–Cu interlayer of 3 nm in the Ta/[NdFeB(180 nm)/MoCu(3 nm)] × 3/Ta thin films annealed at 650 °C, the c-axis of part of the hard magnetic Nd 2 Fe 14 B grains is oriented out-of-plane

Formation of corrosion-resistant oxide film on uranium

International Nuclear Information System (INIS)

Petit, G.S.

1976-01-01

A vacuum heat-treatment method was developed for coating metallic uranium with an adherent protective film of uranium oxide. The film is prepared by vacuum heat-treating the metallic uranium at 625 0 C for 1 h while controlling the amount of oxygen being metered into the furnace. Uranium coupons with the protective film were exposed for several hundred hours in a corrosion test bath at 95 0 C and 100 percent RH without corroding. Film thicknesses ranging from 5 to 25 μm (0.0002 to 0.001 in.) were prepared and corrosion tested; the film thickness can be controlled to less than +-2.5 μm (+-0.0001 in.). The oxide film is hard, nonwetting, and very adherent. The resulting surface finish of the metal is equivalent to that of the original finish. The advantages of the oxide films over other protective coatings are given. 12 fig

Revisiting the definition of local hardness and hardness kernel.

Science.gov (United States)

Polanco-Ramírez, Carlos A; Franco-Pérez, Marco; Carmona-Espíndola, Javier; Gázquez, José L; Ayers, Paul W

2017-05-17

An analysis of the hardness kernel and local hardness is performed to propose new definitions for these quantities that follow a similar pattern to the one that characterizes the quantities associated with softness, that is, we have derived new definitions for which the integral of the hardness kernel over the whole space of one of the variables leads to local hardness, and the integral of local hardness over the whole space leads to global hardness. A basic aspect of the present approach is that global hardness keeps its identity as the second derivative of energy with respect to the number of electrons. Local hardness thus obtained depends on the first and second derivatives of energy and electron density with respect to the number of electrons. When these derivatives are approximated by a smooth quadratic interpolation of energy, the expression for local hardness reduces to the one intuitively proposed by Meneses, Tiznado, Contreras and Fuentealba. However, when one combines the first directional derivatives with smooth second derivatives one finds additional terms that allow one to differentiate local hardness for electrophilic attack from the one for nucleophilic attack. Numerical results related to electrophilic attacks on substituted pyridines, substituted benzenes and substituted ethenes are presented to show the overall performance of the new definition.

Preparation and analysis of amorphous carbon films deposited from (C{sub 6}H{sub 12})/Ar/He chemistry for application as the dry etch hard mask in the semiconductor manufacturing process

Energy Technology Data Exchange (ETDEWEB)

Lee, Seungmoo [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of); TC Technology Team, Samsung Electronics Co. Ltd., Gyeounggi-Do, 446-711 (Korea, Republic of); Won, Jaihyung; Choi, Jongsik [TC Technology Team, Samsung Electronics Co. Ltd., Gyeounggi-Do, 446-711 (Korea, Republic of); Jang, Samseok [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of); Jee, Yeonhong; Lee, Hyeondeok [TC Technology Team, Samsung Electronics Co. Ltd., Gyeounggi-Do, 446-711 (Korea, Republic of); Byun, Dongjin, E-mail: dbyun@korea.ac.kr [Department of Materials Science and Engineering, Korea University, Seoul, 136-701 (Korea, Republic of)

2011-08-01

Amorphous carbon layers (ACL) were deposited on Si (100) wafers by plasma enhanced chemical vapor deposition (PECVD) by using 1-hexene (C{sub 6}H{sub 12}) as a carbon source for dry etch hard mask of semiconductor devices manufacturing process. The deposition characteristics and film properties were investigated by means of ellipsometry, Raman spectroscopy, X-ray photo electron spectroscopy (XPS) and stress analysis. Hardness, Young's modulus, and surface roughness of ACL deposited at 550 deg. C were investigated by using nano-indentation and AFM. The deposition rate was decreased from 5050 A/min to 2160 A/min, and dry etch rate was decreased from 2090 A/min to 1770 A/min, and extinction coefficient was increased from 0.1 to 0.5. Raman analysis revealed a higher shift of the G-peak and a lower shift of the D-peak and the increase of I(D)/I(G) ratio as the deposition temperature was increased from 350 deg. C to 550 deg. C. XPS results of ACL deposited at 550 deg. C revealed a carbon 1s binding energy of 284.4 eV. The compressive film stress was decreased from 2.95 GPa to 1.28 GPa with increasing deposition temperature. The hardness and Young's modulus of ACL deposited at 550 deg. C were 5.8 GPa and 48.7 GPa respectively. The surface roughness RMS of ACL deposited at 550 deg. C was 2.24 A, and that after cleaning in diluted HF solution (H{sub 2}O:HF = 200:1), SC1 (NH{sub 4}OH:H{sub 2}O{sub 2}:H{sub 2}O = 1:4:20) solution, and sulfuric acid solution (H{sub 2}SO{sub 4}:H{sub 2}O{sub 2} = 6:1) was 2.28 A, 2.30 A and 7.34 A, respectively. The removal amount of ACL deposited at 550 deg. C in diluted HF solution, SC1 solution and sulfuric acid solution was 6 A, 36 A and 110 A, respectively. These results demonstrated the viability of ACL deposited by PECVD from C{sub 6}H{sub 12} at 550 deg. C for application as the dry etch hard mask in fabrication of semiconductor devices.

Regression Analysis of the Effect of Bias Voltage on Nano- and Macrotribological Properties of Diamond-Like Carbon Films Deposited by a Filtered Cathodic Vacuum Arc Ion-Plating Method

Directory of Open Access Journals (Sweden)

Shojiro Miyake

2014-01-01

Full Text Available Diamond-like carbon (DLC films are deposited by bend filtered cathodic vacuum arc (FCVA technique with DC and pulsed bias voltage. The effects of varying bias voltage on nanoindentation and nanowear properties were evaluated by atomic force microscopy. DLC films deposited with DC bias voltage of −50 V exhibited the greatest hardness at approximately 50 GPa, a low modulus of dissipation, low elastic modulus to nanoindentation hardness ratio, and high nanowear resistance. Nanoindentation hardness was positively correlated with the Raman peak ratio Id/Ig, whereas wear depth was negatively correlated with this ratio. These nanotribological properties highly depend on the films’ nanostructures. The tribological properties of the FCVA-DLC films were also investigated using a ball-on-disk test. The average friction coefficient of DLC films deposited with DC bias voltage was lower than that of DLC films deposited with pulse bias voltage. The friction coefficient calculated from the ball-on-disk test was correlated with the nanoindentation hardness in dry conditions. However, under boundary lubrication conditions, the friction coefficient and specific wear rate had little correlation with nanoindentation hardness, and wear behavior seemed to be influenced by other factors such as adhesion strength between the film and substrate.

Band gap engineering of hydrogenated amorphous carbon thin films for solar cell application

Science.gov (United States)

Dwivedi, Neeraj; Kumar, Sushil; Dayal, Saurabh; Rauthan, C. M. S.; Panwar, O. S.; Malik, Hitendra K.

2012-10-01

In this work, self bias variation, nitrogen introduction and oxygen plasma (OP) treatment approaches have been used for tailoring the band gap of hydrogenated amorphous carbon (a-C:H) thin films. The band gap of a-C:H and modified a- C:H films is varied in the range from 1.25 eV to 3.45 eV, which is found to be nearly equal to the full solar spectrum (1 eV- 3.5 eV). Hence, such a-C:H and modified a-C:H films are found to be potential candidate for the development of full spectrum solar cells. Besides this, computer aided simulation with considering variable band gap a-C:H and modified a- C:H films as window layer for amorphous silicon p-i-n solar cells is also performed by AFORS-HET software and maximum efficiency as ~14 % is realized. Since a-C:H is hard material, hence a-C:H and modified a-C:H films as window layer may avoid the use of additional hard and protective coating particularly in n-i-p configuration.

Substrate effects on the characteristics of (In2O3)1-x (ZnO)x films

International Nuclear Information System (INIS)

Park, J. M.; Kim, J. J.; Kim, H. M.; Kim, J. H.; Ryu, S. W.; Park, S. H.; Ahn, J. S.

2006-01-01

The electrical and the optical properties of (In 2 O 3 ) 1-x (ZnO) x (IZO) films deposited by the rf magnetron sputtering on plastic substrates, such as polyethylene terephthalate (PET) and poly carbonate (PC), were investigated. The results are compared with those of IZO films deposited on a conventional coring glass (CG) substrate. The average transmittance of the IZO films deposited on plastic substrates is over 80 %, irrespective of the substrate, which is comparable to that of IZO films deposited on CG substrates. IZO films deposited on PC or PET substrates show larger resistivities than those deposited on CG substrates. This may be attributed to the fact that compositions, such as H 2 O or the organic solvent contained in the plastic substrates, are adsorbed into the IZO layer during sputtering. The surface resistance of the IZO films is nearly independent of the substrate and decreases with increasing deposition time. Compared to the IZO films deposited on PET substrates without hard coatings, those deposited on PET substrates with hard coatings show superior electrical stability for thermal environments.

Development and Testing of Abrasion Resistant Hard Coats For Polymer Film Reflectors: Preprint

Energy Technology Data Exchange (ETDEWEB)

Jorgensen, G.; Gee, R.; DiGrazia, M.

2010-10-01

Reflective polymer film technology can significantly reduce the cost of solar reflectors and installed Concentrated Solar Power (CSP) plants by both reduced material cost and lower weight. One challenge of polymer reflectors in the CSP environment pertains to contact cleaning methods typically used with glass mirrors. Such contact cleaning methods can scratch the surface of polymer reflectors and thereby reduce specular reflectance. ReflecTech, Inc. (a subsidiary of SkyFuel, Inc.) and the National Renewable Energy Laboratory (NREL) initiated a cooperative research and development agreement (CRADA) to devise and develop an abrasion resistant coating (ARC) suitable for deposition onto polymer based mirror film. A number of candidate ARC products were identified as candidate formulations. Industrial collaborators prepared samples having their ARCs deposited onto ReflecTech Mirror Film pre-laminated to aluminum sheet substrates. Samples were provided for evaluation and subjected to baseline (unweathered) and accelerated exposure conditions and subsequently characterized for abrasion resistance and adhesion. An advanced ARC product has been identified that exhibits outstanding initial abrasion resistance and adhesion to ReflecTech Mirror Film. These properties were also retained after exposure to the various accelerated stress conditions. This material has been successfully manufactured as a 1.5 m wide roll-to-roll construction in a production environment.

Preparation and Characterization of Formalated Polyvinyl Alcohol Hydrogel Film

International Nuclear Information System (INIS)

Than Than Aye; Nyunt Win; San Myint

2011-12-01

A feasible hydrogen film was prepared from polyvinyl alcohol (PVA) sample. The effect of chemical grafting on polyvinyl alcohol film was studied. Polyvinyl alcohol sample was mixed with distilled water and autoclaved at 121C for 60 minutes. An aqueous solution of polyvinyl alcohol was casted into a steel plate and dried for a certain time at room temperature. The obtained PVA film was immersed in formalation bath containing aqueous formaldehyde, sulphuric acid, anhydrous sodium sulphate with a weight ratio of (64:95:300) and 1 liter of distilled water at 60C for various hours. Effect of formalation time was studied varying 6, 12, 24, 36 and 48 hours. Degree of formalation was also evaluated. Physical properties of the hydrogel film such as gel fraction, degree of swelling and mechanical properties such as tensile strength, elongation and hardness were determined before and after formalation of the PVA film. Fourier Transform Infrared Spectroscopic (FTIR) analysis, Thermogravimetric / Differential thermal analysis (DTA / TG) were also studied for characterization. It was found that the appropriate condition for formalation was occured at 24 hours formalation time of with the calculated degree of formalation 65.35% with the determined values (9.04 Mpa) for tensile strength, (241.92%) for elongation, (45.30 Shore D) for hardness, (280.36%) for degree of swelling and (68.32%) for gel fraction.

The Tribological Behaviors of Three Films Coated on Biomedical Titanium Alloy by Chemical Vapor Deposition

Science.gov (United States)

Wang, Song; Liao, Zhenhua; Liu, Yuhong; Liu, Weiqiang

2015-11-01

Three thin films (DLC, a-C, and TiN) were performed on Ti6Al4V by chemical vapor deposition. Carbon ion implantation was pretreated for DLC and a-C films while Ti transition layer was pretreated for TiN film to strengthen the bonding strength. X-ray diffraction, Raman measurement, nano-hardness and nano-scratch tester, and cross-section etching by FIB method were used to analyze film characteristics. Tribological behaviors of these coatings were studied by articulation with both ZrO2 and UHMWPE balls using ball-on-disk sliding. The thickness values reached ~0.46, ~0.33, and ~1.67 μm for DLC, a-C, and TiN film, respectively. Nano-hardness of the coatings compared with that of untreated and bonding strength (critical load in nano-scratch test) values of composite coatings compared with that of monolayer film all increased significantly, respectively. Under destructive test (ZrO2 ball conterface) in bovine serum lubrication, TiN coating revealed the best wear resistance while DLC showed the worst. Film failure was mainly attributed to the plowing by hard ZrO2 ball characterized by abrasive and adhesive wear. Under normal test (UHMWPE ball conterface), all coatings showed significant improvement in wear resistance both in dry sliding and bovine serum lubrication. Both DLC and a-C films showed less surface damage than TiN film due to the self-lubricating phenomenon in dry sliding. TiN film showed the largest friction coefficient both in destructive and normal tests, devoting to the big TiN grains thus leading to much rougher surface and then a higher value. The self-lubricating film formed on DLC and a-C coating could also decrease their friction coefficients. The results indicated that three coatings revealed different wear mechanisms, and thick DLC or a-C film was more promising in application in lower stress conditions such as artificial cervical disk.

Mechanical and shape memory properties of ferromagnetic Ni2MnGa sputter-deposited films

Science.gov (United States)

Ohtsuka, M.; Matsumoto, M.; Itagaki, K.

2003-10-01

The ternary intermetallic compound Ni2MnGa is an intelligent material, which has a shape memory effect and a ferromagnetic property. Use of shape memory alloy films for an actuator of micro machines is very attractive because of its large recovery force. The data of mechanical and shape memory properties of the films are required to use for the actuator. The purpose of this study is to investigate the effects of fabrication conditions and to clarify the relationships between these properties and fabrication conditions of the Ni{2}MnGa films. The Ni{2}MnGa films were deposited with a radio-frequency magnetron sputtering apparatus using a Ni{50}Mn{25}Ga{25} or Ni{52}Mn{24}Ga{24} target. After deposition, the films were annealed at 873sim 1173 K. The asdeposited films were crystalline and had columnar grains. After the heat treatment, the grains widened and the grain boundary became indistinct with increasing heat treatment temperature. MnO and Ni{3} (Mn, Ga) precipitations were observed in the heat-treated films. The mechanical properties of the films were measured by the nanoindentation method. Hardness and elastic modulus of as-deposited films were larger than those of arcmelted bulk alloys. The hardness of the films was affected by the composition, crystal structure, microstructure and precipitation, etc. The elastic modulus of the films was also changed with the heat treatment conditions. The heat-treated films showed a thermal two-way shape memory effect.

Pulsed laser deposition of AlMgB₁₄ thin films

Energy Technology Data Exchange (ETDEWEB)

Britson, Jason Curtis [Iowa State Univ., Ames, IA (United States)

2008-11-18

Hard, wear-resistant coatings of thin film borides based on AlMgB₁₄ have the potential to be applied industrially to improve the tool life of cutting tools and pump vanes and may account for several million dollars in savings as a result of reduced wear on these parts. Past work with this material has shown that it can have a hardness of up to 45GPa and be fabricated into thin films with a similar hardness using pulsed laser deposition. These films have already been shown to be promising for industrial applications. Cutting tools coated with AlMgB₁₄ used to mill titanium alloys have been shown to substantially reduce the wear on the cutting tool and extend its cutting life. However, little research into the thin film fabrication process using pulsed laser deposition to make AlMgB₁₄ has been conducted. In this work, research was conducted into methods to optimize the deposition parameters for the AlMgB₁₄ films. Processing methods to eliminate large particles on the surface of the AlMgB₁₄ films, produce films that were at least 1m thick, reduce the surface roughness of the films, and improve the adhesion of the thin films were investigated. Use of a femtosecond laser source rather than a nanosecond laser source was found to be effective in eliminating large particles considered detrimental to wear reduction properties from the films. Films produced with the femtosecond laser were also found to be deposited at a rate 100 times faster than those produced with the nanosecond laser. However, films produced with the femtosecond laser developed a relatively high RMS surface roughness around 55nm. Attempts to decrease the surface roughness were largely unsuccessful. Neither increasing the surface temperature of the substrate during deposition nor using a double pulse to ablate the material was found to be extremely successful to reduce the surface roughness. Finally, the adhesion of the thin films to M2 tool steel

Control of composition and crystallinity in hydroxyapatite films deposited by electron cyclotron resonance plasma sputtering

Science.gov (United States)

Akazawa, Housei; Ueno, Yuko

2014-01-01

Hydroxyapatite (HAp) films were deposited by electron cyclotron resonance plasma sputtering under a simultaneous flow of H2O vapor gas. Crystallization during sputter-deposition at elevated temperatures and solid-phase crystallization of amorphous films were compared in terms of film properties. When HAp films were deposited with Ar sputtering gas at temperatures above 460 °C, CaO byproducts precipitated with HAp crystallites. Using Xe instead of Ar resolved the compositional problem, yielding a single HAp phase. Preferentially c-axis-oriented HAp films were obtained at substrate temperatures between 460 and 500 °C and H2O pressures higher than 1×10-2 Pa. The absorption signal of the asymmetric stretching mode of the PO43- unit (ν3) in the Fourier-transform infrared absorption (FT-IR) spectra was the narrowest for films as-crystallized during deposition with Xe, but widest for solid-phase crystallized films. While the symmetric stretching mode of PO43- (ν1) is theoretically IR-inactive, this signal emerged in the FT-IR spectra of solid-phase crystallized films, but was absent for as-crystallized films, indicating superior crystallinity for the latter. The Raman scattering signal corresponding to ν1 PO43- sensitively reflected this crystallinity. The surface hardness of as-crystallized films evaluated by a pencil hardness test was higher than that of solid-phase crystallized films.

Friction Properties of Polished Cvd Diamond Films Sliding against Different Metals

Science.gov (United States)

Lin, Zichao; Sun, Fanghong; Shen, Bin

2016-11-01

Owing to their excellent mechanical and tribological properties, like the well-known extreme hardness, low coefficient of friction and high chemical inertness, chemical vapor deposition (CVD) diamond films have found applications as a hard coating for drawing dies. The surface roughness of the diamond films is one of the most important attributes to the drawing dies. In this paper, the effects of different surface roughnesses on the friction properties of diamond films have been experimentally studied. Diamond films were fabricated using hot filament CVD. The WC-Co (Co 6wt.%) drawing dies were used as substrates. A gas mixture of acetone and hydrogen gas was used as the feedstock gas. The CVD diamond films were polished using mechanical polishing. Polished diamond films with three different surface roughnesses, as well as the unpolished diamond film, were fabricated in order to study the tribological performance between the CVD diamond films and different metals with oil lubrication. The unpolished and polished CVD diamond films are characterized with scanning electron microscope (SEM), atomic force microscope (AFM), surface profilometer, Raman spectrum and X-ray diffraction (XRD). The friction examinations were carried out by using a ball-on-plate type reciprocating friction tester. Low carbide steel, stainless steel, copper and aluminum materials were used as counterpart balls. Based on this study, the results presented the friction coefficients between the polished CVD films and different metals. The friction tests demonstrate that the smooth surface finish of CVD diamond films is beneficial for reducing their friction coefficients. The diamond films exhibit low friction coefficients when slid against the stainless steel balls and low carbide steel ball, lower than that slid against copper ball and aluminum ball, attributed to the higher ductility of copper and aluminum causing larger amount of wear debris adhering to the sliding interface and higher adhesive

Investigation of the Influence of Ni Doping on the Structure and Hardness of Ti-Ni-C Coatings

Directory of Open Access Journals (Sweden)

J. Daniel

2017-01-01

Full Text Available Nanocomposite nc-TiC/a-C:H thin films exhibit unique combination of mechanical properties, high hardness, low friction, and wear. Selective doping by weak-carbide forming element can be used in order to specifically design the physical and chemical properties of nc-TiC/a-C:H coatings. In this paper we report on an effect of nickel addition on structure and hardness of the nc-TiC/a-C:H coatings. The effect of Ni alloying on the coating structure under conditions of DCMS and HiPIMS depositions was studied. The coating structure was correlated with the coating hardness. The grain size, the grain carbon vacancy concentration, and the mean grain separation were found to be the key parameters determining the coating hardness. Ni doping proved to have a significant effect on the coating microstructure which resulted in changes of the hardness of the deposited coatings.

Potential of sago starch/carrageenan mixture as gelatin alternative for hard capsule material

Science.gov (United States)

Poeloengasih, Crescentiana Dewi; Pranoto, Yudi; Anggraheni, Frida Dwi; Marseno, Djagal Wiseso

2017-03-01

In order to replace gelatin in capsule shell production, blends of sago starch and carrageenan were developed. Films and capsules were prepared with 10% (w/v) of sago starch, 25% (w/w starch) of glycerol and various carrageenan concentration (1, 2, 3% w/w starch) in two different kappa/iota-carrageenan ratio (1:3 and 3:1). The resulted films and capsules were characterized by mechanical property, water vapor and oxygen permeability. In addition, moisture absorption and solubility of capsule in acid solution were investigated. The results reveal that addition of carrageenan makes the films stronger and less permeable. Higher kappa-carrageenan content improved tensile strength and barrier properties of the films, whereas higher iota-carrageenan content produced films with higher elongation, moisture absorption and capsule solubility in acid solution. Capsule with 2% (w/w starch) of carrageenan at kappa-/iota-ratio 3:1 had the lowest moisture absorption, whereas capsule with 3% (w/w starch) of carrageenan at kappa/iota ratio 1:3 had the highest solubility. It is illustrated that sago starch/carrageenan blends can be used as hard capsule material.

Viscosity of particle laden films

Directory of Open Access Journals (Sweden)

Timounay Yousra

2017-01-01

Full Text Available We perform retraction experiments on soap films where large particles bridge the two interfaces. Local velocities are measured by PIV during the unstationnary regime. The velocity variation in time and space can be described by a continuous fluid model from which effective viscosity (shear and dilatational of particulate films is measured. The 2D effective viscosity of particulate films η2D increases with particle surface fraction ϕ: at low ϕ, it tends to the interfacial dilatational viscosity of the liquid/air interfaces and it diverges at the critical particle surface fraction ϕc ≃ 0.84. Experimental data agree with classical viscosity laws of hard spheres suspensions adapted to the 2D geometry, assuming viscous dissipation resulting from the squeeze of the liquid/air interfaces between the particles. Finally, we show that the observed viscous dissipation in particulate films has to be considered to describe the edge velocity during a retraction experiment at large particle coverage.

Viscosity of particle laden films

Science.gov (United States)

Timounay, Yousra; Rouyer, Florence

2017-06-01

We perform retraction experiments on soap films where large particles bridge the two interfaces. Local velocities are measured by PIV during the unstationnary regime. The velocity variation in time and space can be described by a continuous fluid model from which effective viscosity (shear and dilatational) of particulate films is measured. The 2D effective viscosity of particulate films η2D increases with particle surface fraction ϕ: at low ϕ, it tends to the interfacial dilatational viscosity of the liquid/air interfaces and it diverges at the critical particle surface fraction ϕc ≃ 0.84. Experimental data agree with classical viscosity laws of hard spheres suspensions adapted to the 2D geometry, assuming viscous dissipation resulting from the squeeze of the liquid/air interfaces between the particles. Finally, we show that the observed viscous dissipation in particulate films has to be considered to describe the edge velocity during a retraction experiment at large particle coverage.

Origin of open recoil curves in L1_0-A1 FePt exchange coupled nanocomposite thin film

International Nuclear Information System (INIS)

Goyal, Rajan; Kapoor, Akanksha; Lamba, S.; Annapoorni, S.

2016-01-01

Mixed phase FePt systems with intergranular coupling may be looked upon as natural exchange spring systems. The coupling strength between the soft and hard phase in these systems can be analyzed using recoil curves. However, the origin of open recoil curves depicting the breakdown of exchange coupling or anisotropy variation in hard phase is still an ambiguity and requires an in-depth analysis. In order to investigate this, an analysis of the recoil curves for L1_0–A1 FePt nanocomposite thin films of varying thickness have been performed. The switching field distribution reveals that the maximum of openness of recoil curve is directly proportional to the amount of uncoupled soft phase present in the system. The coupling between the hard and soft phase is also found to increase with the thickness of the film. Monte Carlo simulations on a model three dimensional array of interacting nanomagnetic grains provide further insight into the effect of inter granular exchange interactions between the soft and hard phases. - Highlights: • L1_0-A1 FePt nanocomposites thin films of different thickness have been fabricated by DC sputtering. • Hysteresis curve measurements exhibit perfect single phase (L1_0) like behavior for thicker films. • SFD reveals that the openness of recoil curves is directly linked with the amount of uncoupled soft (A1) phase. • Monte Carlo simulation predicts that the extent of exchange interaction increases with thickness of the film.

Synthesis, microstructural, optical and mechanical properties of yttria stabilized zirconia thin films

International Nuclear Information System (INIS)

Amézaga-Madrid, P.; Hurtado-Macías, A.; Antúnez-Flores, W.; Estrada-Ortiz, F.; Pizá-Ruiz, P.; Miki-Yoshida, M.

2012-01-01

Highlights: ► Thin films of YSZ obtained by AACVD have high quality. ► They are uniform, very transparent, and have high hardness. ► Optical characterization were performed in detail, optical constants and band gap energy were determined as a function of dopant content. - Abstract: Thin films of yttria-stabilized zirconia (YSZ) exhibit exceptional properties, such as high thermal, chemical and mechanical stability. Here, we report the synthesis of YSZ thin films by aerosol assisted chemical vapour deposition onto borosilicate glass and fused silica substrates. Optimum deposition temperature was 673 ± 5 K. In addition, different Y content was tried to analyse its influence in the microstructure and properties of the films. The films were uniform, transparent and non-light scattering. Surface morphology and cross sectional microstructure were studied by field emission scanning electron microscopy. The microstructure of the films was characterized by grazing incidence X-ray diffraction. Crystallite size and lattice parameter were obtained. Optical properties were analysed from reflectance and transmittance spectra; from these measurements, optical constants and band gap were obtained. Quantum confinement effect, due to the small grain size of the films, was evident in the high band gap energy obtained. Nanoindentation tests were realized at room temperature employing the continuous stiffness measurement method, to determine the hardness and elastic modulus as a function of Y content.

Preparation and Properties of Ti-TiN-Zr-ZrN Multilayer Films on Titanium Alloy Surface

Directory of Open Access Journals (Sweden)

LIN Song-sheng

2017-06-01

Full Text Available 24 cycles Ti-TiN-Zr-ZrN soft-hard alternating multilayer film was deposited on TC11 titanium alloy by vacuum cathodic arc deposition method. The structure and performance of the multilayer film, especially wear and sand erosion resistance were investigated by various analytical methods including pin on disc wear tester, sand erosion tester, 3D surface topography instrument, scanning electron microscopy (SEM, X-ray diffraction(XRD, micro-hardness tester and scratch adhesion tester. The results indicate that the Vickers-hardness of the multilayer film with thickness of 5.8μm can reach up to 28.10GPa. The adhesive strength of these coatings can be as high as 56N. Wear rate of the multilayer coated alloy is one order of magnitude smaller than bare one, which decreased from 7.06×10-13 m3·N-1·m-1 to 3.03×10-14m3·N-1·m-1. Multilayer films can play the role in hindering the extension of cracks, and thus sand erosion properties of the TC11 titanium alloy substrates are improved.

Preparation of boron-nitrogen films by sputtering

International Nuclear Information System (INIS)

Klose, S.; Winde, B.

1980-01-01

Hard boron-nitrogen films adherent to various substrates can be prepared by sputtering. IR investigations suggest the existence of cubic boron nitride in certain layers. Transmission electron microscope studies have shown a quasi-amorphous structure irregularly incorporating crystallites of zinc blende structure of some nm in diameter

Carbon and nitrogen co-doping self-assembled MoS{sub 2} multilayer films

Energy Technology Data Exchange (ETDEWEB)

Zhang, Xiaoqin [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 (China); School of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou 730050 (China); Xu, Jiao; Chai, Liqiang [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 (China); He, Tengfei [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 (China); School of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou 730050 (China); Yu, Fucheng [School of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou 730050 (China); Wang, Peng, E-mail: pengwang@licp.cas.cn [State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 (China)

2017-06-01

Highlights: • Mo–S–C–N composite films were synthesized by using reactive magnetron sputtering. • A self-assembled multilayer structure with periodicity in the nanometer scale was formed in the composite film. • The hardness of Mo–S–C–N film deposited at optimized parameter reaches up to 9.76 GPa. • The wear rate of deposited Mo–S–C–N film both in vacuum and ambient atmosphere decreases dramatically. - Abstract: Mo–S–C–N composite films were prepared using reactive magnetron sputtering of graphite and MoS{sub 2} targets in argon and nitrogen atmospheres. The effects of carbon/nitrogen co-doping and carbon concentration on the composition, microstructure, mechanical and tribological properties of deposited films have been investigated by various characterization techniques. The results show that the deposited films comprise MoS{sub 2} nanocrystalline and amorphous carbon, and the incorporating nitrogen forms Mo-N and C–N chemical bonds. Increasing carbon concentration leads to the increase of sp{sup 2} carbon fraction in the films. Furthermore, the high-resolution transmission electron microscopy reveals that a self-assembled multilayer structure with periodicity in the nanometer scale is formed in the Mo–S–C–N film. Benefiting from the composite and self-assembled multilayer structures, the hardness of Mo–S–C–N film deposited at optimized parameter reaches up to 9.76 GPa, and corresponding friction experiment indicates that this composite films display low friction coefficient and high wear resistance both in vacuum and ambient air conditions.

Structural, mechanical and magnetic study on galvanostatic electroplated nanocrystalline NiFeP thin films

Science.gov (United States)

Kalaivani, A.; Senguttuvan, G.; Kannan, R.

2018-03-01

Nickel based alloys has a huge applications in microelectronics and micro electromechanical systems owing to its superior soft magnetic properties. With the advantages of simplicity, cost-effectiveness and controllable patterning, electroplating processes has been chosen to fabricate thin films in our work. The soft magnetic NiFeP thin film was successfully deposited over the surface of copper plate through galvanostatic electroplating method by applying constant current density of 10 mA cm-2 for a deposition rate for half an hour. The properties of the deposited NiFeP thin films were analyzed by subjecting it into different physio-chemical characterization such as XRD, SEM, EDAX, AFM and VSM. XRD pattern confirms the formation of NiFeP particles and the structural analysis reveals that the NiFeP particles were uniformly deposited over the surface of copper substrate. The surface roughness analysis of the NiFeP films was done using AFM analysis. The magnetic studies and the hardness of the thin film were evaluated from the VSM and hardness test. The NiFeP thin films possess lower coercivity with higher magnetization value of 69. 36 × 10-3 and 431.92 Gauss.

Formation and characterization of titanium nitride and titanium carbide films prepared by reactive sputtering

International Nuclear Information System (INIS)

Sundgren, J.-E.

1982-01-01

Titanium has been reactively r.f. sputtered in mixed Ar-N 2 and Ar-CH 4 discharges on to substrates held at 775 K. The films obtained have been characterized by scanning electron microscopy, X-ray diffraction and by measurements of hardness and electrical resistivity. The compositions of the films have been determined using Auger electron spectroscopy. The processes occurring both on substrates and target surfaces have been studied and it is shown that the latter is of great importance for the composition and structure of deposited films. Titanium nitride films of full density and with electrical resistivity and hardness values close to those of bulk TiN were only obtained in a narrow range close to the stoichiometric composition. Titanium carbide films grown on non-biased substrates were found to have an open structure and thus a low density. A bias applied to the substrate, however, improved the quality of the films. It is also shown that the heat of formation of the compounds plays an important role in the formation of carbides and nitrides. A large value promotes the development of large grains and dense structures. (Auth.)

Titanium nitride stamps replicating nanoporous anodic alumina films

International Nuclear Information System (INIS)

Navas, D; Sanchez, O; Asenjo, A; Jaafar, M; Baldonedo, J L; Vazquez, M; Hernandez-Velez, M

2007-01-01

Fabrication of nanostructured TiN films by magnetron sputtering using nanoporous anodic alumina films (NAAF) as substrates is reported. These hard nanostructured films could be used for pre-patterning aluminium foils and to obtain nanoporous films replicating the starting NAAF over a wide range of pore diameters and spacings. Pre-patterned Al foils are obtained by compression with pressures lower than those previously reported, then a new NAAF can be fabricated by means of only one anodization process. As an example, one of the TiN stamps was used for pre-patterning an Al foil at a pressure of 200 kg cm -2 and then it was anodized in oxalic acid solution obtaining the corresponding replica of the starting NAAF

Study on ionizing radiation effects of bipolar transistor with BPSG films

International Nuclear Information System (INIS)

Lu Man; Zhang Xiaoling; Xie Xuesong; Sun Jiangchao; Wang Pengpeng; Lu Changzhi; Zhang Yanxiu

2013-01-01

Background: Because of the damage induced by ionizing radiation, bipolar transistors in integrated voltage regulator could induce the current gain degradation and increase leakage current. This will bring serious problems to electronic system. Purpose: In order to ensure the reliability of the device work in the radiation environments, the device irradiation reinforcement technology is used. Methods: The characteristics of 60 Co γ irradiation and annealing at different temperatures in bipolar transistors and voltage regulators (JW117) with different passive films for SiO 2 +BPSG+SiO 2 and SiO 2 +SiN have been investigated. Results: The devices with BPSG film enhanced radiation tolerance significantly. Because BPSG films have better absorption for Na + in SiO 2 layer, the surface recombination rate of base region in a bipolar transistor and the excess base current have been reduced. It may be the main reason for BJT with BPSG film having a good radiation hardness. And annealing experiments at different temperatures after irradiation ensure the reliability of the devices with BPSG films. Conclusions: A method of improving the ionizing irradiation hardness of bipolar transistors is proposed. As well as the linear integrated circuits which containing bipolar transistors, an experimental basis for the anti-ionizing radiation effects of bipolar transistors is provided. (authors)

Mechanical properties of UO{sub 2} thin films under heavy ion irradiation using nanoindentation and finite element modeling

Energy Technology Data Exchange (ETDEWEB)

Elbakhshwan, Mohamed S., E-mail: elbakhs1@illinois.edu; Miao, Yinbin; Stubbins, James F.; Heuser, Brent J.

2016-10-15

The mechanical response of UO{sub 2} to irradiation is becoming increasingly important due to the shift to higher burn-up rates in the next generation of nuclear reactors. In the current study, thin films of UO{sub 2} were deposited on YSZ substrates using reactive-gas magnetron sputtering. Nanoindentation was used to measure the mechanical properties of the as-grown and irradiated films. Finite element modeling was used to account for the substrate effect on the measurements. In order to study the effect of displacement cascades accompanying gas bubbles, 5000 Å UO{sub 2} films were irradiated with 600 keV Kr{sup +} ions at 25 °C and 600 °C. These irradiation conditions were used to confine radiation damage effects and implanted gas within the film. Results showed an increase in the film hardness and yield strength with dose, while elastic modulus initially decreased with irradiation and then kept increasing with dose. The change in hardness and elastic modulus is attributed to the introduction of gas bubbles and displacement cascade damage. Irradiation at 600 °C resulted in a decrease in the hardness and elastic modulus after irradiation using 600 keV Kr{sup +} at a dose of 1E14 ions/cm{sup 2}. Both hardness and elastic modulus then increased with irradiation dose. This behavior is attributed to recrystallization during irradiation at 600 °C and the formation of nanocrystallite regions with diameter and density that increase with dose. The calculation of the critical resolved shear stress (CRSS) demonstrated that nanocrystals are the primary cause for film hardening based on the Orowan hardening mechanism.

Ultra low nanowear in novel chromium/amorphous chromium carbide nanocomposite films

Science.gov (United States)

Yate, Luis; Martínez-de-Olcoz, Leyre; Esteve, Joan; Lousa, Arturo

2017-10-01

In this work, we report the first observation of novel nanocomposite thin films consisting of nanocrystalline chromium embedded in an amorphous chromium carbide matrix (nc-Cr/a-CrC) with relatively high hardness (∼22,3 GPa) and ultra low nanowear. The films were deposited onto silicon substrates using a magnetic filtered cathodic arc deposition system at various negative bias voltages, from 50 to 450 V. X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) suggested the co-existence of chromium and chromium carbide phases, while high resolution transmission electron microscopy (HRTEM) confirmed the presence of the nc-Cr/a-CrC structure. The friction coefficient measured with the ball-on disk technique and the nanowear results showed a strong correlation between the macro and nano-tribological properties of the samples. These novel nanocomposite films show promising properties as solid lubricant and wear resistant coatings with relatively high hardness, low friction coefficient and ultra low nanowear.

Robust tribo-mechanical and hot corrosion resistance of ultra-refractory Ta-Hf-C ternary alloy films.

Science.gov (United States)

Yate, Luis; Coy, L Emerson; Aperador, Willian

2017-06-08

In this work we report the hot corrosion properties of binary and ternary films of the Ta-Hf-C system in V 2 O 5 -Na 2 SO 4 (50%wt.-50%wt.) molten salts at 700 °C deposited on AISI D3 steel substrates. Additionally, the mechanical and nanowear properties of the films were studied. The results show that the ternary alloys consist of solid solutions of the TaC and HfC binary carbides. The ternary alloy films have higher hardness and elastic recoveries, reaching 26.2 GPa and 87%, respectively, and lower nanowear when compared to the binary films. The corrosion rates of the ternary alloys have a superior behavior compared to the binary films, with corrosion rates as low as 0.058 μm/year. The combination and tunability of high hardness, elastic recovery, low nanowear and an excellent resistance to high temperature corrosion demonstrates the potential of the ternary Ta-Hf-C alloy films for applications in extreme conditions.

Effect of Heat and Laser Treatment on Cu2S Thin Film Sprayed on Polyimide Substrate

Science.gov (United States)

Magdy, Wafaa; Mahmoud, Fawzy A.; Nassar, Amira H.

2018-02-01

Three samples of copper sulfide Cu2S thin film were deposited on polyimide substrate by spray pyrolysis using deposition temperature of 400°C and deposition time of about 45 min. One of the samples was left as deposited, another was heat treated, while the third was laser treated. The structural, surface morphological, optical, mechanical, and electrical properties of the films were investigated. X-ray diffraction (XRD) analysis showed that the copper sulfide films were close to copper-rich phase (Cu2S). Increased crystallite size after heat and laser treatment was confirmed by XRD analysis and scanning electron microscopy. Vickers hardness measurements showed that the samples' hardness values were enhanced with increasing crystallite size, representing an inverse Hall-Petch (H-P) effect. The calculated optical bandgap of the treated films was lower than that of the deposited film. Finally, it was found that both heat and laser treatment enhanced the physical properties of the sprayed Cu2S films on polyimide substrate for use in solar energy applications.

Effect of annealing on the mechanical and scratch properties of BCN films obtained by magnetron sputtering deposition

Energy Technology Data Exchange (ETDEWEB)

Xu, Shuyan, E-mail: xsynefu@126.com [Key Laboratory of Forest Sustainable Management and Environmental Microorganism Engineering of Heilongjiang Province, Northeast Forestry University, Harbin 150040 (China); Ma, Xinxin [School of Material Science and Engineering, Harbin Institute of Technology, Harbin 150001 (China); Wen, Huiying [Key Laboratory of Forest Sustainable Management and Environmental Microorganism Engineering of Heilongjiang Province, Northeast Forestry University, Harbin 150040 (China); Tang, Guangze [School of Material Science and Engineering, Harbin Institute of Technology, Harbin 150001 (China); Li, Chunwei [Key Laboratory of Forest Sustainable Management and Environmental Microorganism Engineering of Heilongjiang Province, Northeast Forestry University, Harbin 150040 (China)

2014-09-15

Highlights: • The amorphous BCN films were annealed at different temperatures under vacuum condition. • The order degree increases with the annealing temperature increasing, and the films do not decompose even the annealing temperature rise to 1000 °C. • The nano-hardness and modulus of the films decrease with the increasing of annealing temperatures. • The critical load of BCN films is not affected by the annealing temperature, and the films have good interfacial adhesion. • The scratch resistance properties of BCN film are improved by annealing at 600 °C. - Abstract: Boron-carbon-nitride (BCN) films have been fabricated by direct current unbalanced magnetron sputtering. Boron carbide/graphite compound and a mixture of nitrogen and argon are used as target and carrier gas, respectively, during BCN synthesis. The obtained BCN films are annealed at different temperatures under vacuum condition. The effect of annealing temperature on the structure, mechanical properties and scratch behavior of the BCN films has been investigated. The results indicate that no decomposition products are found even the BCN films are annealed at 1000 °C. The hardness and elastic modulus of the films decrease with the increase of annealing temperatures. The BCN film annealed at 600 °C has the strongest scratch resistance. The friction coefficient of all BCN films is in range of 0.05 to 0.15.

Effect of annealing on the mechanical and scratch properties of BCN films obtained by magnetron sputtering deposition

International Nuclear Information System (INIS)

Xu, Shuyan; Ma, Xinxin; Wen, Huiying; Tang, Guangze; Li, Chunwei

2014-01-01

Highlights: • The amorphous BCN films were annealed at different temperatures under vacuum condition. • The order degree increases with the annealing temperature increasing, and the films do not decompose even the annealing temperature rise to 1000 °C. • The nano-hardness and modulus of the films decrease with the increasing of annealing temperatures. • The critical load of BCN films is not affected by the annealing temperature, and the films have good interfacial adhesion. • The scratch resistance properties of BCN film are improved by annealing at 600 °C. - Abstract: Boron-carbon-nitride (BCN) films have been fabricated by direct current unbalanced magnetron sputtering. Boron carbide/graphite compound and a mixture of nitrogen and argon are used as target and carrier gas, respectively, during BCN synthesis. The obtained BCN films are annealed at different temperatures under vacuum condition. The effect of annealing temperature on the structure, mechanical properties and scratch behavior of the BCN films has been investigated. The results indicate that no decomposition products are found even the BCN films are annealed at 1000 °C. The hardness and elastic modulus of the films decrease with the increase of annealing temperatures. The BCN film annealed at 600 °C has the strongest scratch resistance. The friction coefficient of all BCN films is in range of 0.05 to 0.15

Origin of open recoil curves in L1{sub 0}-A1 FePt exchange coupled nanocomposite thin film

Energy Technology Data Exchange (ETDEWEB)

Goyal, Rajan [Department of Physics and Astrophysics, University of Delhi, Delhi 110007 (India); Kapoor, Akanksha [M. Tech Nanoscience and Nanotechnology, University of Delhi, Delhi 110007 (India); Lamba, S. [School of Sciences, Indira Gandhi National Open University, New Delhi 110068 (India); Annapoorni, S., E-mail: annapoornis@yahoo.co.in [Department of Physics and Astrophysics, University of Delhi, Delhi 110007 (India)

2016-11-15

Mixed phase FePt systems with intergranular coupling may be looked upon as natural exchange spring systems. The coupling strength between the soft and hard phase in these systems can be analyzed using recoil curves. However, the origin of open recoil curves depicting the breakdown of exchange coupling or anisotropy variation in hard phase is still an ambiguity and requires an in-depth analysis. In order to investigate this, an analysis of the recoil curves for L1{sub 0}–A1 FePt nanocomposite thin films of varying thickness have been performed. The switching field distribution reveals that the maximum of openness of recoil curve is directly proportional to the amount of uncoupled soft phase present in the system. The coupling between the hard and soft phase is also found to increase with the thickness of the film. Monte Carlo simulations on a model three dimensional array of interacting nanomagnetic grains provide further insight into the effect of inter granular exchange interactions between the soft and hard phases. - Highlights: • L1{sub 0}-A1 FePt nanocomposites thin films of different thickness have been fabricated by DC sputtering. • Hysteresis curve measurements exhibit perfect single phase (L1{sub 0}) like behavior for thicker films. • SFD reveals that the openness of recoil curves is directly linked with the amount of uncoupled soft (A1) phase. • Monte Carlo simulation predicts that the extent of exchange interaction increases with thickness of the film.

Performance evaluation of cassava starch-zinc nanocomposite film for tomatoes packaging

Directory of Open Access Journals (Sweden)

Adeshina Fadeyibi

2017-05-01

Full Text Available Biodegradable nanocomposite films are novel materials for food packaging because of their potential to extend the shelf life of food. In this research, the performance of cassava starch-zincnanocomposite film was evaluated for tomatoes packaging. The films were developed by casting the solutions of 24 g cassava starch, 0-2% (w/w zinc nanoparticles and 55% (w/w glycerol in plastic mould of 12 mm depth. The permeability of the films, due to water and oxygen, was investigated at 27°C and 65% relative humidity while the mechanical properties were determined by nanoindentation technique. The average thickness of the dried nanocomposite films was found to be 17±0.13 μm. The performances of films for tomatoes packaging was evaluated in comparison with low density polyethylene (LDPE; 10 μm at the temperature and period ranges of 10-27°C and 0-9 days, respectively. The quality and microbial attributes of the packaged tomatoes, including ascorbic acid, β-carotene and total coliform were analysed at an interval of 3 days. The results revealed that the water vapour permeability increased while the oxygen permeability decreased with the nanoparticles (P<0.05. The hardness, creep, elastic and plastic works, which determined the plasticity index of the film, decreased generally with the nanoparticles. The films containing 1 and 2% of the nanoparticles suppressed the growth of microorganisms and retained the quality of tomatoes than the LDPE at 27°C and day-9 of packaging (P<0.05. The results implied that the film could effectively be used for tomatoes packaging due to their lower oxygen permeability, hardness, elastic and plastic works.

Resistive Switching Characteristics in Electrochemically Synthesized ZnO Films

Directory of Open Access Journals (Sweden)

Shuhan Jing

2015-04-01

Full Text Available The semiconductor industry has long been seeking a new kind of non-volatile memory technology with high-density, high-speed, and low-power consumption. This study demonstrated the electrochemical synthesis of ZnO films without adding any soft or hard templates. The effect of deposition temperatures on crystal structure, surface morphology and resistive switching characteristics were investigated. Our findings reveal that the crystallinity, surface morphology and resistive switching characteristics of ZnO thin films can be well tuned by controlling deposition temperature. A conducting filament based model is proposed to explain the switching mechanism in ZnO thin films.

Nanomechanical properties of GaSe thin films deposited on Si(1 1 1) substrates by pulsed laser deposition

International Nuclear Information System (INIS)

Jian, Sheng-Rui; Juang, Jenh-Yih; Luo, Chih-Wei; Ku, Shin-An; Wu, Kaung-Hsiung

2012-01-01

Highlights: ► GaSe thin films are grown by PLD. ► Structural properties of GaSe thin films are measured by XRD. ► Hardness and Young’s modulus of GaSe thin films are measured by nanoindentation. - Abstract: The correlations between the crystalline structure and mechanical properties of GaSe thin films were investigated by means of X-ray diffraction (XRD) and nanoindentation techniques. The GaSe thin films were deposited on Si(1 1 1) substrates deposited at various deposition temperatures using pulsed laser deposition (PLD). The XRD results indicate that all the GaSe thin films are pure hexagonal phase with highly (0 0 0 l)-oriented characteristics. Nanoindentation results revealed apparent discontinuities (so-called multiple “pop-in” events) in the load-displacement curve, while no discontinuity was observed in the unloading segment of the load-displacement curve. The hardness and Young’s modulus of GaSe thin films determined by the continuous stiffness measurements (CSM) method indicated that both mechanical parameters increased with the increasing deposition temperature with the hardness and the Young’s modulus being increased from 1.2 ± 0.1 to 1.8 ± 0.1 GPa and from 39.6 ± 1.2 to 68.9 ± 2.7 GPa, respectively, as the deposition temperature was raised from 400 to 475 °C. These results suggest that the increased grain size might have played a prominent role in determining the mechanical properties of the PLD-derived GaSe thin films.

Berkovich Nanoindentation on AlN Thin Films

Directory of Open Access Journals (Sweden)

Jian Sheng-Rui

2010-01-01

Full Text Available Abstract Berkovich nanoindentation-induced mechanical deformation mechanisms of AlN thin films have been investigated by using atomic force microscopy (AFM and cross-sectional transmission electron microscopy (XTEM techniques. AlN thin films are deposited on the metal-organic chemical-vapor deposition (MOCVD derived Si-doped (2 × 1017 cm−3 GaN template by using the helicon sputtering system. The XTEM samples were prepared by means of focused ion beam (FIB milling to accurately position the cross-section of the nanoindented area. The hardness and Young’s modulus of AlN thin films were measured by a Berkovich nanoindenter operated with the continuous contact stiffness measurements (CSM option. The obtained values of the hardness and Young’s modulus are 22 and 332 GPa, respectively. The XTEM images taken in the vicinity regions just underneath the indenter tip revealed that the multiple “pop-ins” observed in the load–displacement curve during loading are due primarily to the activities of dislocation nucleation and propagation. The absence of discontinuities in the unloading segments of load–displacement curve suggests that no pressure-induced phase transition was involved. Results obtained in this study may also have technological implications for estimating possible mechanical damages induced by the fabrication processes of making the AlN-based devices.

Glass microspheres covering film: first field evaluations

International Nuclear Information System (INIS)

Magnani, G.; Filippi, F.

2006-01-01

A trial was carried out to evaluate, in the North-Centre of Italy, the behaviour in field of a new plastic covering film, prepared with the inclusion of empty glass microspheres (Solex). The trial was conducted on tomato (Lycopersicon esculentum L.) and eggplant (Solanum melongena L.). The new film was compared to a covering film with the same optical (diffuse light) and constitutional (co-extruded three layers EVA-WPE) characteristics. Since the first results, the innovative film showed a better behaviour than the control one. It presented light and thermal conditions (lower temperature during the day and slightly higher temperature in the night, compared to the control film) that allowed a better growth and yield than the control film. The growth analysis of tomato showed that plants grown under glass microsphere film had an higher growth rate (dry weight/days) and thickness of leaves compared to the control one. The yield of tomato and eggplant presented an increase in plants cultivated under the innovative film, especially for number and weight of fruits. The commercial quality did not show any differences between the films, except for the flesh hardness of tomato: this could be explained with the fact that the glass microspheres film provides environmental conditions avoiding plant stress during some stages of its cycle [it

Effect of modulation periods on the microstructure and mechanical properties of DLC/TiC multilayer films deposited by filtered cathodic vacuum arc method

International Nuclear Information System (INIS)

Xu, Zhaoying; Sun, H.; Leng, Y.X.; Li, Xueyuan; Yang, Wenmao; Huang, N.

2015-01-01

Highlights: • DLC/TiC multilayer films with different modulation periods at same modulation ratio 1:1 were deposited by FCVA. • The residual stress of DLC/TiC multilayer films decreases with the modulation periods decrease. • The hardness of the multilayer DLC films decreases with modulation periods increasing. - Abstract: The high stress of diamond-like carbon (DLC) film limits its thickness and adhesion on substrate. Multilayer structure is one approach to overcome this disadvantage. In this paper, the DLC/TiC multilayer films with different modulation periods (80 nm, 106 nm or 160 nm) at same modulation ratio of 1:1 were deposited on Si(1 0 0) wafer and Ti-6Al-4V substrate by filtered cathodic vacuum arc (FCVA) technology. X-ray diffraction (XRD), transmission electron microscopy (TEM), nanoindention and wear test were employed to investigate the effect of modulation periods on the microstructure and mechanical properties of the multilayer films. The results showed that the residual stress of the DLC/TiC multilayer films could be effectively reduced and the residual stress decreased with the modulation periods decreasing. The hardness of the DLC/TiC multilayer films increased with modulation periods decreasing. The DLC/TiC multilayer film with modulation period of 106 nm had the best wear resistance due to the good combination of hardness, ductility and low compressive stress

Nitrogen doping for adhesion improvement of DLC film deposited on Si substrate by Filtered Cathodic Vacuum Arc (FCVA) technique

Energy Technology Data Exchange (ETDEWEB)

Bootkul, D., E-mail: mo_duangkhae@hotmail.com [Department of General Science, Faculty of Science, Srinakharinwirot University, Bangkok 10110 (Thailand); Supsermpol, B.; Saenphinit, N. [Western Digital Company, Ayutthaya 13160 (Thailand); Aramwit, C. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50202 (Thailand); Intarasiri, S., E-mail: saweat@gmail.com [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50202 (Thailand)

2014-08-15

Diamond-like carbon (DLC) films have been used in many applications due to their attractive combination of properties including chemical inertness, corrosion protection, biocompatibility, high hardness, and low wear rates. However, they still have some limitations such as high internal stresses and low toughness which lead to poor adhesion of films. Synthesis of nitrogen-doped DLC (N-DLC) offers the possibility of overcoming these limitations. In this study, DLC films, namely tetrahedral amorphous carbon (ta-C) and nitrogen doped tetrahedral amorphous carbon (ta-C:N) were deposited on single crystalline Si wafer substrates using the Filtered Cathodic Vacuum Arc (FCVA) technique. Film characterizations were carried out by Raman spectroscopy, atomic force microscopy (AFM), scanning electron microscopy (SEM), triboindenter tester and nano-scratch tester. Measurement results showed that intentionally doping with nitrogen reduced the carbon sp{sup 3} content and increased the surface roughness in comparison with that of pure ta-C films. The hardness measurement confirmed the Raman and AFM analyses that adding nitrogen in ta-C films decreased the hardness, especially with high nitrogen content. However, the nano-scratch test revealed the increasing of the critical load with nitrogen. This work, then, extended its scope to investigate the properties of double-layer ta-C films which were composed of ta-C:N interlayer of various thickness around 10–30 nm and ta-C top-layer with thickness of around 80 nm. Microstructure characterization demonstrated that a ta-C:N interlayer gradually decreased the sp{sup 3} fraction in the films and increased film roughness whenever the ta-C:N interlayer thickness increased. In this structure, the tribological property in terms of adhesion to the Si substrate was significantly improved by about 20–90%, but the mechanical property in terms of hardness was gradually degraded by about 2–10%, compared to pure ta-C film, when the ta

Effects of ion irradiation on the mechanical properties of SiNawOxCyHz sol-gel derived thin films

International Nuclear Information System (INIS)

Lucca, D.A.; Qi, Y.; Harriman, T.A.; Prenzel, T.; Wang, Y.Q.; Nastasi, M.; Dong, J.; Mehner, A.

2010-01-01

A study of the effects of ion irradiation of hybrid organic/inorganic modified silicate thin films on their mechanical properties is presented. NaOH catalyzed SiNa w O x C y H z thin films were synthesized by sol-gel processing from tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) precursors and spin-coated onto Si substrates. After drying at 300 o C, the films were irradiated with 125 keV H + or 250 keV N 2+ at fluences ranging from 1 x 10 14 to 2.5 x 10 16 ions/cm 2 . Nanoindentation was used to characterize the films. Changes in hardness and reduced elastic modulus were examined as a function of ion fluence and irradiating species. The resulting increases in hardness and reduced elastic modulus are compared to similarly processed acid catalyzed silicate thin films.

Effect of pulse frequency and current density on anomalous composition and nanomechanical property of electrodeposited Ni-Co films

Energy Technology Data Exchange (ETDEWEB)

Chung, C.K., E-mail: ckchung@mail.ncku.edu.t [Department of Mechanical Engineering, and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan 701 (China); Chang, W.T. [Department of Mechanical Engineering, and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan 701 (China)

2009-07-01

Effect of pulse frequency and current density on the anomalous cobalt content and nanomechanical property of the electrodeposited nickel-cobalt (Ni-Co) films has been investigated. The composition, morphology, phase and hardness of the Ni-Co alloy films were examined by scanning electron microscope with an attached energy dispersive X-ray spectroscope, X-ray diffraction and nanoindentation techniques, respectively. The different Co composition of the Ni-Co films codeposited from the fixed sulfamate-chloride bath is subject to the pulse frequencies and current densities. The frequencies varied from 0 to 100 Hz and current densities varied from 1 to 20 ASD (ampere per square decimeter). The Co composition has no significant variation in pulse electrodeposition but it is greatly influenced by current densities from 22.53% at 1 ASD decreased to 13.39% at 20 ASD under DC codeposition. The mean hardness of Ni-Co films has no eminent change at a pulse frequency of 10-100 Hz but it decreases with current densities from 8.72 GPa (1 ASD) to 7.13 GPa (20 ASD). The smoother morphology can be obtained at higher pulse frequency or lower current density. Good Ni-Co films with high hardness and smooth morphology can be obtained by reducing current density and increasing pulse frequency.

Effect of Heat treatment on Hardness and Corrosion Resistance of Super Cast Iron

Energy Technology Data Exchange (ETDEWEB)

Lee, Roun; Kim, Young Sik [Andong National University, Andong (Korea, Republic of)

2014-07-15

In fossil-fuel-fired power plants, a variety of pollutants are produced from the combustion of conventional fuels such as coal, oil and gas. Major component of such pollution are ash and corrosive chemicals, which also destroy pumps and piping; by causing erosion/corrosion, pitting, and wear. In order to over come such damage, materials with high hardness and high corrosion resistance are needed. In this work, we melted super-cast-iron with excellent corrosion resistance and high hardness. To elucidate the effect of heat treatment, microstructural analysis, hardness measurement, and corrosion tests were performed. Test results revealed that the super-cast-iron had several tens better corrosion resistance than 316 L stainless steel, and it also had a high surface hardness (> HRC45). High hardness, in spite of its low carbon content (0.74%C), could resulted from a hardening heat treatment to precipitate sufficient Cr{sub 7}C{sub 3} and Cr{sub 2}3C{sub 6}. Also, it was concluded that the excellent corrosion resistance of the super-cast-iron was due to the increase of the relative chromium content by minimizing the carbon content, and by the enhancement of passive film by the addition of Cr, Mo, Cu, and W.

Influence of annealing temperature on the structural, optical and mechanical properties of ALD-derived ZnO thin films

International Nuclear Information System (INIS)

Yen, C.-Y.; Jian, S.-R.; Chen, G.-J.; Lin, C.-M.; Lee, H.-Y.; Ke, W.-C.; Liao, Y.-Y.; Yang, P.-F.; Wang, C.-T.; Lai, Y.-S.; Jang, Jason S.-C.; Juang, J.-Y.

2011-01-01

ZnO thin films grown on Si(1 1 1) substrates by using atomic layer deposition (ALD) were annealed at the temperatures ranging from 300 to 500 deg. C. The X-ray diffraction (XRD) results show that the annealed ZnO thin films are highly (0 0 2)-oriented, indicating a well ordered microstructure. The film surface examined by the atomic force microscopy (AFM), however, indicated that the roughness increases with increasing annealing temperature. The photoluminescence (PL) spectrum showed that the intensity of UV emission was strongest for films annealed at 500 deg. C. The mechanical properties of the resultant ZnO thin films investigated by nanoindentation reveal that the hardness decreases from 9.2 GPa to 7.2 GPa for films annealed at 300 deg. C and 500 deg. C, respectively. On the other hand, the Young's modulus for the former is 168.6 GPa as compared to a value of 139.5 GPa for the latter. Moreover, the relationship between the hardness and film grain size appear to follow closely with the Hall-Petch equation.

Abrasion resistant low friction and ultra-hard magnetron sputtered AlMgB14 coatings

Science.gov (United States)

Grishin, A. M.

2016-04-01

Hard aluminum magnesium boride films were fabricated by RF magnetron sputtering from a single stoichiometric AlMgB14 ceramic target. X-ray amorphous AlMgB14 films are very smooth. Their roughness does not exceed the roughness of Si wafer and Corning glass used as the substrates. Dispersion of refractive index and extinction coefficient were determined within 300 to 2500 nm range for the film deposited onto Corning glass. Stoichiometric in-depth compositionally homogeneous 2 μm thick films on the Si(100) wafer possess the peak values of nanohardness 88 GPa and Young’s modulus 517 GPa at the penetration depth of 26 nm and, respectively, 35 GPa and 275 GPa at 200 nm depth. Friction coefficient was found to be 0.06. The coating scratch adhesion strength of 14 N was obtained as the first chipping of the coating whereas its spallation failure happened at 21 N. These critical loads and the work of adhesion, estimated as high as 18.4 J m-2, surpass characteristics of diamond like carbon films deposited onto tungsten carbide-cobalt (WC-Co) substrates.

Influence of modulation periods on the tribological behavior of Si/a-C: H multilayer film

Science.gov (United States)

Zhu, Linan; Wu, Yanxia; Zhang, Shujiao; Yu, Shengwang; Tang, Bin; Liu, Ying; Zhou, Bing; Shen, Yanyan

2018-01-01

A series of Si/a-C: H multilayer films with different modulation periods were fabricated on stainless steel and silicon substrates by radio-frequency magnetron sputtering. The influence of the modulation period on the structure, morphology, mechanical properties and tribological behaviors in different environments (air, simulated acid rain, and NaCl solution) was investigated. The results show that the content of the sp2 hybrid carbon, surface roughness and hardness of the multilayer film increased firstly and then decreased with the decreased modulation period. Furthermore, the combination of the sublayer agrees well with the formation of the SiC crystal at the interface. Interestingly, the films show quite substantially different tribological properties in various test environments. The lowest friction coefficient is 0.2 for the S1 film in air. However, the lowest friction coefficient can reach 0.13 in solution. Importantly, the tribological behavior of the multilayer film is mainly determined by its hardness, as well as surface roughness in air while it is closely related with modulation period and interface structure in solution.

High Temperature Magnetic Properties of Indirect Exchange Spring FePt/M(Cu,C/Fe Trilayer Thin Films

Directory of Open Access Journals (Sweden)

Anabil Gayen

2013-01-01

Full Text Available We report the investigation of temperature dependent magnetic properties of FePt and FePt(30/M(Cu,C/Fe(5 trilayer thin films prepared by using magnetron sputtering technique at ambient temperature and postannealed at different temperatures. L10 ordering, hard magnetic properties, and thermal stability of FePt films are improved with increasing postannealing temperature. In FePt/M/Fe trilayer, the formation of interlayer exchange coupling between magnetic layers depends on interlayer materials and interface morphology. In FePt/C/Fe trilayer, when the C interlayer thickness was about 0.5 nm, a strong interlayer exchange coupling between hard and soft layers was achieved, and saturation magnetization was enhanced considerably after using interlayer exchange coupling with Fe. In addition, incoherent magnetization reversal process observed in FePt/Fe films changes into coherent switching process in FePt/C/Fe films giving rise to a single hysteresis loop. High temperature magnetic studies up to 573 K reveal that the effective reduction in the coercivity decreases largely from 34 Oe/K for FePt/Fe film to 13 Oe/K for FePt/C(0.5/Fe film demonstrating that the interlayer exchange coupling seems to be a promising approach to improve the stability of hard magnetic properties at high temperatures, which is suitable for high-performance magnets and thermally assisted magnetic recording media.

TiCN thin films grown by reactive crossed beam pulsed laser deposition

Science.gov (United States)

Escobar-Alarcón, L.; Camps, E.; Romero, S.; Muhl, S.; Camps, I.; Haro-Poniatowski, E.

2010-12-01

In this work, we used a crossed plasma configuration where the ablation of two different targets in a reactive atmosphere was performed to prepare nanocrystalline thin films of ternary compounds. In order to assess this alternative deposition configuration, titanium carbonitride (TiCN) thin films were deposited. Two crossed plasmas were produced by simultaneously ablating titanium and graphite targets in an Ar/N2 atmosphere. Films were deposited at room temperature onto Si (100) and AISI 4140 steel substrates whilst keeping the ablation conditions of the Ti target constant. By varying the laser fluence on the carbon target it was possible to study the effect of the carbon plasma on the characteristics of the deposited TiCN films. The structure and composition of the films were analyzed by X-ray Diffraction, Raman Spectroscopy and non-Rutherford Backscattering Spectroscopy. The hardness and elastic modulus of the films was also measured by nanoindentation. In general, the experimental results showed that the TiCN thin films were highly oriented in the (111) crystallographic direction with crystallite sizes as small as 6.0 nm. It was found that the hardness increased as the laser fluence was increased, reaching a maximum value of about 33 GPa and an elastic modulus of 244 GPa. With the proposed configuration, the carbon content could be easily varied from 42 to 5 at.% by changing the laser fluence on the carbon target.

Effect of sputtered titanium interlayers on the properties of nanocrystalline diamond films

Energy Technology Data Exchange (ETDEWEB)

Li, Cuiping, E-mail: licp226@126.com, E-mail: limingji@163.com; Li, Mingji, E-mail: licp226@126.com, E-mail: limingji@163.com; Wu, Xiaoguo; Yang, Baohe [Tianjin Key Laboratory of Film Electronic and Communicate Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin 300384 (China); Dai, Wei; Xu, Sheng [Tianjin Key Laboratory of Film Electronic and Communicate Devices, School of Electronics Information Engineering, Tianjin University of Technology, Tianjin 300384 (China); College of Precision Instrument and Optoelectronics Engineering, Tianjin University, Tianjin 300072 (China); Li, Hongji [Tianjin Key Laboratory of Organic Solar Cells and Photochemical Conversion, School of Chemistry and Chemical Engineering, Tianjin University of Technology, Tianjin 300384 (China)

2016-04-07

Ti interlayers with different thicknesses were sputtered on Si substrates and then ultrasonically seeded in a diamond powder suspension. Nanocrystalline diamond (NCD) films were deposited using a dc arc plasma jet chemical vapor deposition system on the seeded Ti/Si substrates. Atomic force microscopy and scanning electron microscopy tests showed that the roughness of the prepared Ti interlayer increased with increasing thickness. The effects of Ti interlayers with various thicknesses on the properties of NCD films were investigated. The results show nucleation, growth, and microstructure of the NCD films are strongly influenced by the Ti interlayers. The addition of a Ti interlayer between the Si substrate and the NCD films can significantly enhance the nucleation rate and reduce the surface roughness of the NCD. The NCD film on a 120 nm Ti interlayer possesses the fastest nucleation rate and the smoothest surface. Raman spectra of the NCD films show trans-polyacetylene relevant peaks reduce with increasing Ti interlayer thickness, which can owe to the improvement of crystalline at grain boundaries. Furthermore, nanoindentation measurement results show that the NCD film on a 120 nm Ti interlayer displays a higher hardness and elastic modulus. High resolution transmission electron microscopy images of a cross-section show that C atoms diffuse into the Ti layer and Si substrate and form TiC and SiC hard phases, which can explain the enhancement of mechanical properties of NCD.

Friction behaviour of anodic oxide film on aluminum impregnated with molybdenum sulfide compounds

Energy Technology Data Exchange (ETDEWEB)

Maejima, M.; Saruwatari, K. [Fujikura Ltd., Tokyo (Japan); Takaya, M. [Faculty of Engineering, Chiba Institute of Technology 17-1, Tsudanuma 2-Chome, 275-0016, Narasino-shi Chiba (Japan)

2000-10-23

In order to improve the lubricity and wear resistance of aluminum anodic oxide films, it is necessary to ensure the film layers are dense to prevent cracking, and to harden the films as well as reduce the shear stress of the film surfaces. From this view point, lubricious, hard anodic oxide films have been studied in the past, but fully satisfactory results have yet to be realized. In this paper, we report on our study of the re-anodizing of anodic oxide film in an aqueous solution of (NH)MoS. Molybdenum sulfide and compounds filled the 20-nm diameter pores of the film, creating internal stress which compressed the film, suppressing the occurrence of cracks and reducing the friction coefficient. (orig.)

Production and characterization of Si-N films obtained by r.f. magnetron sputtering

International Nuclear Information System (INIS)

Oliveira, A.; Cavaleiro, A.; Vieira, M.T.

1993-01-01

Si-N films were deposited by sputtering from an Si 3 N 4 target with different deposition pressures and negative substrate bias. The films were amorphous and showed a ''featureless'' morphology. A high oxygen content was detected in unbiased films. For these films the Si/N ratio was very high compared with the target composition, whereas for biased films the opposite was observed. Si-N films presented cohesive failures for loads as high as 21 N and adhesive failure at 45 N when they were analysed by scratch test. Very high hardness (45 GPa) was obtained, particularly for biased films. Unbiased films were softer, which is attributed to the formation of silicon oxide and/or to a lower compressive stress level. (orig.)

Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

Science.gov (United States)

Song, Liang; Wang, Xianping; Wang, Le; Zhang, Ying; Liu, Wang; Jiang, Weibing; Zhang, Tao; Fang, Qianfeng; Liu, Changsong

2017-04-01

He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y2O3 in the FeCrNi films was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y2O3 in FeCrNi films, and Y2O3 content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y2O3 apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (˜17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.

Effects of bias voltage and annealing on the structure and mechanical properties of WC0.75N0.25 thin films

International Nuclear Information System (INIS)

Su, Y.D.; Hu, C.Q.; Wen, M.; Wang, C.; Liu, D.S.; Zheng, W.T.

2009-01-01

We investigated the effects of both bias voltage and annealing on the structure and mechanical properties of WC 0.75 N 0.25 thin films, deposited on Si (1 0 0) substrates by a direct current reactive magnetron sputtering system, in which the negative substrate bias voltage (V b ) was varied from floating (-1.6 V) to -200 V, and the deposited films were annealed at 800 deg. C for 2 h. The X-ray photoelectron spectroscopy and selected area electron diffraction analyses, along with the density-functional theory (DFT) calculations on the electronic structure, showed that WC 0.75 N 0.25 films were a single-phase of carbonitrides. After annealing, a significant decrease in hardness for the films was observed, being a result of point-defect annihilation as V b was in the range of floating to -120 V. However, when V b was in the range of -160 to -200 V, the hardness increased from ∼37 GPa for the as-deposited film to a maximum of ∼43 GPa for the annealed one. This increase in hardness after annealing might be attributed to age-hardening.

Selectively Patterning Polymer Opal Films via Microimprint Lithography.

Science.gov (United States)

Ding, Tao; Zhao, Qibin; Smoukov, Stoyan K; Baumberg, Jeremy J

2014-11-01

Large-scale structural color flexible coatings have been hard to create, and patterning color on them is key to many applications, including large-area strain sensors, wall-size displays, security devices, and smart fabrics. To achieve controlled tuning, a micro-imprinting technique is applied here to pattern both the surface morphology and the structural color of the polymer opal films (POFs). These POFs are made of 3D ordered arrays of hard spherical particles embedded inside soft shells. The soft outer shells cause the POFs to deform upon imprinting with a pre-patterned stamp, driving a flow of the soft polymer and a rearrangement of the hard spheres within the films. As a result, a patterned surface morphology is generated within the POFs and the structural colors are selectively modified within different regions. These changes are dependent on the pressure, temperature, and duration of imprinting, as well as the feature sizes in the stamps. Moreover, the pattern geometry and structural colors can then be further tuned by stretching. Micropattern color generation upon imprinting depends on control of colloidal transport in a polymer matrix under shear flow and brings many potential properties including stretchability and tunability, as well as being of fundamental interest.

Gold film with gold nitride - A conductor but harder than gold

International Nuclear Information System (INIS)

Siller, L.; Peltekis, N.; Krishnamurthy, S.; Chao, Y.; Bull, S.J.; Hunt, M.R.C.

2005-01-01

The formation of surface nitrides on gold films is a particularly attractive proposition, addressing the need to produce harder, but still conductive, gold coatings which reduce wear but avoid the pollution associated with conventional additives. Here we report production of large area gold nitride films on silicon substrates, using reactive ion sputtering and plasma etching, without the need for ultrahigh vacuum. Nanoindentation data show that gold nitride films have a hardness ∼50% greater than that of pure gold. These results are important for large-scale applications of gold nitride in coatings and electronics

SURFACE FILMS TO SUPPRESS FIELD EMISSION IN HIGH-POWER MICROWAVE COMPONENTS

Energy Technology Data Exchange (ETDEWEB)

Hirshfield, Jay l

2014-02-07

Results are reported on attempts to reduce the RF breakdown probability on copper accelerator structures by applying thin surface films that could suppress field emission of electrons. Techniques for application and testing of copper samples with films of metals with work functions higher than copper are described, principally for application of platinum films, since platinum has the second highest work function of any metal. Techniques for application of insulating films are also described, since these can suppress field emission and damage on account of dielectric shielding of fields at the copper surface, and on account of the greater hardness of insulating films, as compared with copper. In particular, application of zirconium oxide films on high-field portions of a 11.424 GHz SLAC cavity structure for breakdown tests are described.

Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition

Science.gov (United States)

Turri, Rafael G.; Santos, Ricardo M.; Rangel, Elidiane C.; da Cruz, Nilson C.; Bortoleto, José R. R.; Dias da Silva, José H.; Antonio, César Augusto; Durrant, Steven F.

2013-09-01

Diverse amorphous hydrogenated carbon-based films (a-C:H, a-C:H:F, a-C:H:N, a-C:H:Cl and a-C:H:Si:O) were obtained by radiofrequency plasma enhanced chemical vapor deposition (PECVD) and plasma immersion ion implantation and deposition (PIIID). The same precursors were used in the production of each pair of each type of film, such as a-C:H, using both PECVD and PIIID. Optical properties, namely the refractive index, n, absorption coefficient, α, and optical gap, ETauc, of these films were obtained via transmission spectra in the ultraviolet-visible near-infrared range (wavelengths from 300 to 3300 nm). Film hardness, elastic modulus and stiffness were obtained as a function of depth using nano-indentation. Surface energy values were calculated from liquid drop contact angle data. Film roughness and morphology were assessed using atomic force microscopy (AFM). The PIIID films were usually thinner and possessed higher refractive indices than the PECVD films. Determined refractive indices are consistent with literature values for similar types of films. Values of ETauc were increased in the PIIID films compared to the PECVD films. An exception was the a-C:H:Si:O films, for which that obtained by PIIID was thicker and exhibited a decreased ETauc. The mechanical properties - hardness, elastic modulus and stiffness - of films produced by PECVD and PIIID generally present small differences. An interesting effect is the increase in the hardness of a-C:H:Cl films from 1.0 to 3.0 GPa when ion implantation is employed. Surface energy correlates well with surface roughness. The implanted films are usually smoother than those obtained by PECVD.

Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition

International Nuclear Information System (INIS)

Turri, Rafael G.; Santos, Ricardo M.; Rangel, Elidiane C.; Cruz, Nilson C. da; Bortoleto, José R.R.; Dias da Silva, José H.; Antonio, César Augusto; Durrant, Steven F.

2013-01-01

Diverse amorphous hydrogenated carbon-based films (a-C:H, a-C:H:F, a-C:H:N, a-C:H:Cl and a-C:H:Si:O) were obtained by radiofrequency plasma enhanced chemical vapor deposition (PECVD) and plasma immersion ion implantation and deposition (PIIID). The same precursors were used in the production of each pair of each type of film, such as a-C:H, using both PECVD and PIIID. Optical properties, namely the refractive index, n, absorption coefficient, α, and optical gap, E Tauc , of these films were obtained via transmission spectra in the ultraviolet–visible near-infrared range (wavelengths from 300 to 3300 nm). Film hardness, elastic modulus and stiffness were obtained as a function of depth using nano-indentation. Surface energy values were calculated from liquid drop contact angle data. Film roughness and morphology were assessed using atomic force microscopy (AFM). The PIIID films were usually thinner and possessed higher refractive indices than the PECVD films. Determined refractive indices are consistent with literature values for similar types of films. Values of E Tauc were increased in the PIIID films compared to the PECVD films. An exception was the a-C:H:Si:O films, for which that obtained by PIIID was thicker and exhibited a decreased E Tauc . The mechanical properties – hardness, elastic modulus and stiffness – of films produced by PECVD and PIIID generally present small differences. An interesting effect is the increase in the hardness of a-C:H:Cl films from 1.0 to 3.0 GPa when ion implantation is employed. Surface energy correlates well with surface roughness. The implanted films are usually smoother than those obtained by PECVD.

High performance hard magnetic NdFeB thick films for integration into micro-electro-mechanical systems

International Nuclear Information System (INIS)

Dempsey, N. M.; Walther, A.; May, F.; Givord, D.; Khlopkov, K.; Gutfleisch, O.

2007-01-01

5 μm thick NdFeB films have been sputtered onto 100 mm Si substrates using high rate sputtering (18 μm/h). Films were deposited at ≤500 deg. C and then annealed at 750 deg. C for 10 min. While films deposited at temperatures up to 450 deg. C have equiaxed grains, the size of which decreases with increasing deposition temperature, the films deposited at 500 deg. C have columnar grains. The out-of-plane remanent magnetization increases with deposition temperature, reaching a maximum value of 1.4 T, while the coercivity remains constant at about 1.6 T. The maximum energy product achieved (400 kJ/m 3 ) is comparable to that of high-quality NdFeB sintered magnets

Physical-mechanical properties of Ti-Al-N films, deposited from mixed two-component vacuum arc plasma stream

International Nuclear Information System (INIS)

Aksenov, D.S.; Aksenov, I.I.; Luchaninov, A.A.; Reshetnyak, E.N.; Strel'nitskij, V.E.; Tolmacheva, G.N.; Yurkov, S.A.

2011-01-01

Ti-Al-N films were obtained by vacuum arc system equipped with two-channel T-shaped magnetic filter. The films were deposited by mixing of filtered plasma streams from two sources with cathodes made of aluminium and titanium in nitrogen environment. An influence of aluminium concentration and substrate bias on structure, hardness and elastic modulus of deposited films was studied by X-ray diffraction analysis and nanoindentation techniques. It was found that coatings with aluminium content in range from 13 to 47 at. % are characterized by cubic nitride based on TiN with NaCl structure. An increase of Al content to 71 at. % leads to the formation of hexagonal AlN-based nitride with wurtzite-like structure. Maximum hardness of 35 GPa is observed in films with 47 at. % aluminium concentration and -100 V substrate bias. Elastic modulus falls off along with increase of Al content and negative substrate bias.

Influence of H-C bonds on the stopping power of hard and soft carbonized layers

International Nuclear Information System (INIS)

Boutard, D.; Moeller, W.; Scherzer, B.M.U.

1988-01-01

Soft and hard carbon-hydrogen films were deposited in a rf glow discharge. Their stopping powers were deduced from depth-profile analysis by means of proton enhanced-cross-section scattering at around 1.5 MeV and 4 He + elastic-recoil detection at 2.6 MeV. In the case of soft films, ion-induced hydrogen depletion allowed study of the dependence of the stopping on hydrogen concentration. The presence of hydrogen increases the stopping power of the film by a factor of up to ∼2 compared to the predicted value for pure carbon. Moreover, Bragg's rule underestimates the total stopping considerably. However, good agreement is obtained with a recent theoretical model by Sabin et al. which takes into account the different C-C and C-H s

The determination of the pressure viscosity coefficient of a lubricant through an accurate film thickness formula and accurate film thickness measurements

NARCIS (Netherlands)

Leeuwen, van H.J.

2009-01-01

The pressure viscosity coefficient is an indispensable property in the EHD lubrication of hard contacts, but often not known. A guess will easily lead to enormous errors in the film thickness. This paper describes a method to deduct this coefficient by adapting the value of the pressure viscosity

Atomic force microscopy indentation of fluorocarbon thin films fabricated by plasma enhanced chemical deposition at low radio frequency power

International Nuclear Information System (INIS)

Sirghi, L.; Ruiz, A.; Colpo, P.; Rossi, F.

2009-01-01

Atomic force microscopy (AFM) indentation technique is used for characterization of mechanical properties of fluorocarbon (CF x ) thin films obtained from C 4 F 8 gas by plasma enhanced chemical vapour deposition at low r.f. power (5-30 W) and d.c. bias potential (10-80 V). This particular deposition method renders films with good hydrophobic property and high plastic compliance. Commercially available AFM probes with stiff cantilevers (10-20 N/m) and silicon sharpened tips (tip radius < 10 nm) are used for indentations and imaging of the resulted indentation imprints. Force depth curves and imprint characteristics are used for determination of film hardness, elasticity modulus and plasticity index. The measurements show that the decrease of the discharge power results in deposition of films with decreased hardness and stiffness and increased plasticity index. Nanolithography based on AFM indentation is demonstrated on thin films (thickness of 40 nm) with good plastic compliance.

Structural, morphological and mechanical properties of niobium nitride thin films grown by ion and electron beams emanated from plasma

Science.gov (United States)

Siddiqui, Jamil; Hussain, Tousif; Ahmad, Riaz; Umar, Zeeshan A.; Abdus Samad, Ubair

2016-05-01

The influence of variation in plasma deposition parameters on the structural, morphological and mechanical characteristics of the niobium nitride films grown by plasma-emanated ion and electron beams are investigated. Crystallographic investigation made by X-ray diffractometer shows that the film synthesized at 10 cm axial distance with 15 plasma focus shots (PFS) exhibits better crystallinity when compared to the other deposition conditions. Morphological analysis made by scanning electron microscope reveals a definite granular pattern composed of homogeneously distributed nano-spheroids grown as clustered particles for the film synthesized at 10 cm axial distance for 15 PFS. Roughness analysis demonstrates higher rms roughness for the films synthesized at shorter axial distance and by greater number of PFS. Maximum niobium atomic percentage (35.8) and maximum average hardness (19.4 ± 0.4 GPa) characterized by energy-dispersive spectroscopy and nano-hardness analyzer respectively are observed for film synthesized at 10 cm axial distance with 15 PFS.

Study of Nd:YAG laser annealing of electroless Ni-P film on spiegel-iron plate by Taguchi method and grey system theory

Energy Technology Data Exchange (ETDEWEB)

Liu, W.L. [Department of Materials Science and Engineering, National Formosa University, 64, Wunhua Road, Huwei, Yunlin 632, Taiwan (China); Chien, W.T.; Jiang, M.H. [Department of Mechanical Engineering, National Pingtung University of Science and Technology, 1, Shuehfu Road, Neipu, Pingtung 912, Taiwan (China); Chen, W.J., E-mail: chenwjau@yuntech.edu.t [Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou, Yunlin 64002, Taiwan (China)

2010-04-09

An electroless Ni-P film was first deposited on a spiegel-iron plate and then annealed by an Nd:YAG pulsed wave laser. In order to obtain the optimal laser annealing parameters for maximizing the hardness and minimizing the surface roughness of electroless Ni-P films, the Taguchi method and grey system theory were used to analyze the experimental data. The electroless Ni-P film was also characterized by scanning electron microscopy for the morphology, and transmission electron microscopy for the microstructure and crystal structure. The results showed that the hardness and the surface roughness of electroless Ni-P films can be, at the same time, improved to 50.8% and 68%, respectively, by the laser annealing with the optimal parameters.

Study of Nd:YAG laser annealing of electroless Ni-P film on spiegel-iron plate by Taguchi method and grey system theory

International Nuclear Information System (INIS)

Liu, W.L.; Chien, W.T.; Jiang, M.H.; Chen, W.J.

2010-01-01

An electroless Ni-P film was first deposited on a spiegel-iron plate and then annealed by an Nd:YAG pulsed wave laser. In order to obtain the optimal laser annealing parameters for maximizing the hardness and minimizing the surface roughness of electroless Ni-P films, the Taguchi method and grey system theory were used to analyze the experimental data. The electroless Ni-P film was also characterized by scanning electron microscopy for the morphology, and transmission electron microscopy for the microstructure and crystal structure. The results showed that the hardness and the surface roughness of electroless Ni-P films can be, at the same time, improved to 50.8% and 68%, respectively, by the laser annealing with the optimal parameters.

Deposit of thin films of TiN, a-C, Ti/TiN/a-C by laser ablation; Deposito de peliculas delgadas de TiN, a-C, Ti/TiN/a-C por ablacion laser

Energy Technology Data Exchange (ETDEWEB)

Mejia, I.S.; Escobar A, L.; Camps, E.; Romero, S. [ININ, 52045 Ocoyoacac, Estado de mexico (Mexico); Muhl, S. [IIM, UNAM, A.P. 364, 01000 Mexico D.F. (Mexico)

2006-07-01

Thin films of titanium nitride (TiN), amorphous carbon (a-C), as well as bilayers of Ti/TiN/a-C were deposited by means of the laser ablation technique. It was investigated the effect that it has the laser fluence used to ablation the targets in the structure and mechanical properties of the TiN deposited films. The TiN obtained films have a preferential orientation in the direction (200). The results show that the hardness of this material is influenced by the laser fluence. It is observed that the hardness is increased in an approximately lineal way with the increment of the fluence up to 19 J/cm{sup 2}. The films of amorphous carbon present hardness of the order of 11.2 GPa. Likewise it was found that the multilayers of Ti/TiN/aC presented a bigger hardness that of its individual components. (Author)

Structural characterization of thin films of titanium nitride deposited by laser ablation; Caracterizacion estructural de peliculas delgadas de nitruro de titanio depositadas por ablacion laser

Energy Technology Data Exchange (ETDEWEB)

Castro C, M.A.; Escobar A, L.; Camps C, E.; Mejia H, J.A. [ININ, 52045 Ocoyoacac, Estado de Mexico (Mexico)

2004-07-01

Thin films of titanium nitride were deposited using the technique of laser ablation. It was studied the effect of the density of laser energy used for ablation the target as well as of the pressure of the work gas about the structure and the hardness of the deposited thin films. Depending on the pressure of the work gas films was obtained with preferential orientation in the directions (200) and (111). At a pressure of 1 x 10{sup -2} Torr only the direction (200) was observed. On the other hand to the pressure of 5 x 10{sup -3} Torr the deposited material this formed by a mixture of the orientation (200) and (111), being the direction (111) the predominant one. Thin films of Ti N were obtained with hardness of up to 24.0 GPa that makes to these attractive materials for mechanical applications. The hardness showed an approximately linear dependence with the energy density. (Author)

Future Hard Disk Storage: Limits & Potential Solutions

Science.gov (United States)

Lambeth, David N.

2000-03-01

For several years the hard disk drive technology pace has raced along at 60-100products this year and laboratory demonstrations approaching what has been estimated as a physical thermal stability limit of around 40 Gbit/in2. For sometime now the data storage industry has recogniz d that doing business as usually will not be viable for long and so both incremental evolutionary and revolutionary technologies are being explored. While new recording head materials or thermal recording techniques may allow higher coercivity materials to be recorded upon, and while high sensitivity spin transport transducer technology may provide sufficient signals to extend beyond the 100 Gigabit/in2 regime, conventional isotropic longitudinal media will show large data retention problems at less than 1/2 of this value. We have recently developed a simple model which indicates that while thermal instability issues may appear at different areal densities, they are non-discriminatory as to the magnetic recording modality: longitudinal, perpendicular, magnetooptic, near field, etc. The model indicates that a strong orientation of the media tends to abate the onset of the thermal limit. Hence, for the past few years we have taken an approach of controlled growth of the microstructure of thin film media. This knowledge has lead us to believe that epitaxial growth of multiple thin film layers on single crystalline Si may provide a pathway to nearly perfect crystallites of various, highly oriented, thin film textures. Here we provide an overview of the recording system media challenges, which are useful for the development of a future media design philosophy and then discuss materials issues and processing techniques for multi-layered thin film material structures which may be used to achieve media structures which can easy exceed the limits predicted for isotropic media.

Studies of the process of an unsteady formation of hard nitride coatings in an arc plasma flow

International Nuclear Information System (INIS)

Zake, M.

1996-01-01

The kinetic studies of an unsteady formation of hard ZrN and TiN coatings on the surface of metallic (Zr, Ti) samples in an Ar-N plasma flow are carried out. The obtained result is that at the initial stage of an unsteady heating of titanium samples nitrogen atoms penetrate into metal lattice and form interstitial compounds of hard nitrogen solutions in α-phase of Ti. This process is followed by a growth of thin surface layers of titanium nitrides with subsequent changes of surface radiance of exposed samples. Unsteady formation of ZrN is a similar two-stage process which includes the ZrN film growth and formation of a α-hard solution with subsequent changes of total normal emissivity of the surface. (author). 1 ref., 1 fig

Single layer and multilayer wear resistant coatings of (Ti,Al)N: a review

International Nuclear Information System (INIS)

PalDey, S.; Deevi, S.C.

2003-01-01

We review the status of (Ti,Al)N based coatings obtained by various physical vapor deposition (PVD) techniques and compare their properties. PVD techniques based on sputtering and cathodic arc methods are widely used to deposit wear resistant (Ti,Al)N coatings. These techniques were further modified to improve the metal ionization rate and to eliminate macrodroplets from plasma streams. We summarize manufacture of target/cathode, substrate materials for deposition of coatings, deposition parameters, and the effect of deposition parameters on the physical and mechanical properties of (Ti,Al)N coatings. It is shown that (Ti,Al)N coatings by PVD enhance the wear, thermal, and oxidation resistance of a wide variety of tool materials. We discuss the wear resistant properties of (Ti,Al)N for various machining applications as compared with coatings such as TiN, Ti(C,N) and (Ti,Zr)N. High hardness (∼28-32 GPa), relatively low residual stress (∼5 GPa), superior oxidation resistance, high hot hardness, and low thermal conductivity make (Ti,Al)N coatings most desirable in dry machining and machining of abrasive alloys at high speeds. Multicomponent coatings based on different metallic and nonmetallic elements combine the benefit of individual components leading to a further refinement of coating properties. Alloying additions such as Cr and Y drastically improve the oxidation resistance, Zr and V improve the wear resistance, whereas, Si increases the hardness and resistance to chemical reactivity of the film. Addition of boron improves the abrasive wear behavior of Ti-Al based coatings due to the formation of TiB 2 and BN phases depending on the deposition conditions. Hafnium based nitrides and carbides have potential for resistance to flank and crater wear. The presence of a large number of interfaces between individual layers of a multilayered structure results in a drastic increase in hardness and strength. (Ti,Al)N multilayer super lattice coatings with lattice

Characteristics of W Doped Nanocrystalline Carbon Films Prepared by Unbalanced Magnetron Sputtering.

Science.gov (United States)

Park, Yong Seob; Park, Chul Min; Kim, Nam-Hoon; Kim, Jae-Moon

2016-05-01

Nanocrystalline tungsten doped carbon (WC) films were prepared by unbalanced magnetron sputtering. Tungsten was used as the doping material in carbon thin films with the aim of application as a contact strip in an electric railway. The structural, physical, and electrical properties of the fabricated WC films with various DC bias voltages were investigated. The films had a uniform and smooth surface. Hardness and frication characteristics of the films were improved, and the resistivity and sheet resistance decreased with increasing negative DC bias voltage. These results are associated with the nanocrystalline WC phase and sp(2) clusters in carbon networks increased by ion bombardment enhanced with increasing DC bias voltage. Consequently, the increase of sp(2) clusters containing WC nanocrystalline in the carbon films is attributed to the improvement in the physical and electrical properties.

Interobserver agreement and performance score comparison in quality control using a breast phantom: screen-film mammography vs computed radiography

International Nuclear Information System (INIS)

Shimamoto, Kazuhiro; Ikeda, Mitsuru; Satake, Hiroko; Ishigaki, Satoko; Sawaki, Akiko; Ishigaki, Takeo

2002-01-01

Our objective was to evaluate interobserver agreement and to compare the performance score in quality control of screen-film mammography and computed radiography (CR) using a breast phantom. Eleven radiologists interpreted a breast phantom image (CIRS model X) by four viewing methods: (a) original screen-film; (b) soft-copy reading of the digitized film image; (c) hard-copy reading of CR using an imaging plate; and (d) soft-copy reading of CR. For the soft-copy reading, a 17-in. CRT monitor (1024 x 1536 x 8 bits) was used. The phantom image was evaluated using a scoring system outlined in the instruction manual, and observers judged each object using a three-point rating scale: (a) clearly seen; (b) barely seen; and (c) not seen. For statistical analysis, the kappa statistic was employed. For ''mass'' depiction, interobserver agreement using CR was significantly lower than when using screen-film (p<0.05). There was no significant difference in the kappa value for detecting ''microcalcification''; however, the performance score of ''microcalcification'' on CR hard-copy was significantly lower than on the other three viewing methods (p<0.05). Viewing methods (film or CR, soft-copy or hard-copy) could affect how the phantom image is judged. Paying special attention to viewing conditions is recommended for quality control of CR mammograms. (orig.)

[Comparison of detectability of liquid crystal displays (LCDs) and film using phantoms of small adenocarcinomas as abnormalities].

Science.gov (United States)

Mochizuki, Yasuo; Abe, Shinji; Monma, Masahiko; Yamaguchi, Kojirou; Adachi, Toshiki

2011-01-01

Following the trend of the digitalization of the modalities used for diagnostic imaging, the devices for such imaging have increasingly included monitors. The present study was undertaken to evaluate the usefulness of soft-copy (liquid crystal display; LCD) images of phantoms of small adenocarcinomas using receiver operating characteristic (ROC) analysis of two different display systems: LCD and hard copy (film). A two-tailed paired t-test and the jackknife method (parametric methods) were performed, and no significant differences were found in the area under the ROC curve (AUC) for the pulmonary fields, lungs, ribs, or mediastinum between the film and LCD display systems, and the detectability did not differ between the film and LCD monitors. A Mann-Whitney U test, which is a non-parametric method that applies to the analysis of a small sample, also showed no significant differences in the AUC. The results of this study suggest that LCDs can replace hard-copy film as a display system if the signals.

Hard X-ray sources from miniature plasma focus devices

International Nuclear Information System (INIS)

Raspa, V.; Silva, P.; Moreno, J.; Zambra, M.; Soto, L.

2004-01-01

As first stage of a program to design a repetitive pulsed radiation generator for industrial applications, two miniature plasma foci have been designed and constructed at the Chilean commission of nuclear energy. The devices operate at an energy level of the order of tens of joules (PF-50 J, 160 nF capacitor bank, 20-35 kV, 32-100 J, ∼ 150 ns time to peak current) and hundred of joules (PF-400 J, 880 nF, 20-35 kV, 176-539 J, ∼ 300 ns time to peak current). Hard X-rays are being studied in these devices operating with hydrogen. Images of metallic plates with different thickness were obtained on commercial radiographic film, Agfa Curix ST-G2, in order to characterize the energy of the hard X-ray outside of the discharge chamber of PF-400 J. An effective energy of the order of 90 keV was measured under those conditions. X ray images of different metallic objects also have been obtained. (authors)

Hard X-ray sources from miniature plasma focus devices

Energy Technology Data Exchange (ETDEWEB)

Raspa, V. [Buenos Aires Univ., PLADEMA, CONICET and INFIP (Argentina); Silva, P.; Moreno, J.; Zambra, M.; Soto, L. [Comision Chilena de Energia Nuclear, Santiago (Chile)

2004-07-01

As first stage of a program to design a repetitive pulsed radiation generator for industrial applications, two miniature plasma foci have been designed and constructed at the Chilean commission of nuclear energy. The devices operate at an energy level of the order of tens of joules (PF-50 J, 160 nF capacitor bank, 20-35 kV, 32-100 J, {approx} 150 ns time to peak current) and hundred of joules (PF-400 J, 880 nF, 20-35 kV, 176-539 J, {approx} 300 ns time to peak current). Hard X-rays are being studied in these devices operating with hydrogen. Images of metallic plates with different thickness were obtained on commercial radiographic film, Agfa Curix ST-G2, in order to characterize the energy of the hard X-ray outside of the discharge chamber of PF-400 J. An effective energy of the order of 90 keV was measured under those conditions. X ray images of different metallic objects also have been obtained. (authors)

Mechanical, tribological and corrosion properties of CrBN films deposited by combined direct current and radio frequency magnetron sputtering

International Nuclear Information System (INIS)

Jahodova, Vera; Ding, Xing-zhao; Seng, Debbie H.L.; Gulbinski, W.; Louda, P.

2013-01-01

Cr–B–N films were deposited on stainless steel substrates by a combined direct current and radio frequency (RF) reactive unbalanced magnetron sputtering process using two elemental Cr and one compound BN targets. Boron content in the as-deposited films was qualitatively analyzed by time-of-flight secondary ion mass spectroscopy. Films' microstructure, mechanical and tribological properties were characterized by X-ray diffraction, nanoindentation and pin-on-disk tribometer experiments. Corrosion behavior of the Cr–B–N films was evaluated by electrochemical potentiodynamic polarization method in a 3 wt.% NaCl solution. All the films were crystallized into a NaCl-type cubic structure. At lower RF power applied on the BN target (≤ 600 W), films are relatively randomly oriented, and films' crystallinity increased with increasing RF power. With increasing RF power further (≥ 800 W), films became (200) preferentially oriented, and films' crystallinity decreased gradually. With incorporation of a small amount of boron atoms into the CrN films, hardness, wear- and corrosion-resistance were all improved evidently. The best wear and corrosion resistance was obtained for the film deposited with 600 W RF power applied on the BN target. - Highlights: • CrBN films deposited by direct current and radio frequency magnetron sputtering. • CrBN exhibited higher hardness, wear- and corrosion-resistance than pure CrN. • The best wear- and corrosion-resistant film was deposited with 600 W RF power

One-Pot Fabrication of Antireflective/Antibacterial Dual-Function Ag NP-Containing Mesoporous Silica Thin Films.

Science.gov (United States)

Wang, Kaikai; He, Junhui

2018-04-04

Thin films that integrate antireflective and antibacterial dual functions are not only scientifically interesting but also highly desired in many practical applications. Unfortunately, very few studies have been devoted to the preparation of thin films with both antireflective and antibacterial properties. In this study, mesoporous silica (MSiO 2 ) thin films with uniformly dispersed Ag nanoparticles (Ag NPs) were prepared through a one-pot process, which simultaneously shows high transmittance, excellent antibacterial activity, and mechanical robustness. The optimal thin-film-coated glass substrate demonstrates a maximum transmittance of 98.8% and an average transmittance of 97.1%, respectively, in the spectral range of 400-800 nm. The growth and multiplication of typical bacteria, Escherichia coli ( E. coli), were effectively inhibited on the coated glass. Pencil hardness test, tape adhesion test, and sponge washing test showed favorable mechanical robustness with 5H pencil hardness, 5A grade adhesion, and functional durability of the coating, which promises great potential for applications in various touch screens, windows for hygiene environments, and optical apparatuses for medical uses such as endoscope, and so on.

Complementary SAXS and SANS for structural characteristics of a polyurethethane elastomer of low hard-segment content

International Nuclear Information System (INIS)

Sun, Y.-S.; Jeng, U-S.; Huang, Y.-S.; Liang, K.S.; Lin, T.-L.; Tsao, C.-S.

2006-01-01

A polyurethane (PU) elastomer film based on segmented poly(tetramethylene oxide) (PTMO) has been studied using wide-angle X-ray scattering (WAXS), and small-angle X-ray and neutron scattering (SAXS and SANS). The broad WAXS peaks measured for the PU elastomer reveal a low crystallinity of the soft segments PTMO and no crystalline domains for the hard segments, methylene bis(4-isocynatobenzene) (MDI), at 20 deg. C. Whereas small-angle scattering indicates the existence of hard-segment-rich aggregates. Using the contrast variation provided by the SANS and SAXS, we have extracted detailed structural information of the aggregates, including the shape, size, and the aggregation numbers

Electrochemically synthesized amorphous and crystalline nanowires: dissimilar nanomechanical behavior in comparison with homologous flat films

Science.gov (United States)

Zeeshan, M. A.; Esqué-de Los Ojos, D.; Castro-Hartmann, P.; Guerrero, M.; Nogués, J.; Suriñach, S.; Baró, M. D.; Nelson, B. J.; Pané, S.; Pellicer, E.; Sort, J.

2016-01-01

The effects of constrained sample dimensions on the mechanical behavior of crystalline materials have been extensively investigated. However, there is no clear understanding of these effects in nano-sized amorphous samples. Herein, nanoindentation together with finite element simulations are used to compare the properties of crystalline and glassy CoNi(Re)P electrodeposited nanowires (φ ~ 100 nm) with films (3 μm thick) of analogous composition and structure. The results reveal that amorphous nanowires exhibit a larger hardness, lower Young's modulus and higher plasticity index than glassy films. Conversely, the very large hardness and higher Young's modulus of crystalline nanowires are accompanied by a decrease in plasticity with respect to the homologous crystalline films. Remarkably, proper interpretation of the mechanical properties of the nanowires requires taking the curved geometry of the indented surface and sink-in effects into account. These findings are of high relevance for optimizing the performance of new, mechanically-robust, nanoscale materials for increasingly complex miniaturized devices.The effects of constrained sample dimensions on the mechanical behavior of crystalline materials have been extensively investigated. However, there is no clear understanding of these effects in nano-sized amorphous samples. Herein, nanoindentation together with finite element simulations are used to compare the properties of crystalline and glassy CoNi(Re)P electrodeposited nanowires (φ ~ 100 nm) with films (3 μm thick) of analogous composition and structure. The results reveal that amorphous nanowires exhibit a larger hardness, lower Young's modulus and higher plasticity index than glassy films. Conversely, the very large hardness and higher Young's modulus of crystalline nanowires are accompanied by a decrease in plasticity with respect to the homologous crystalline films. Remarkably, proper interpretation of the mechanical properties of the nanowires

The preparation and corrosion resistance of Ce and Nd modified anodic films on aluminum

International Nuclear Information System (INIS)

Li Qizheng; Tang Yuming; Zuo Yu

2010-01-01

Rare earth element Ce and Nd modified anodic films were prepared on aluminum surface by a relatively simple method: the aluminum samples were first immersed in Ni(NO 3 ) 2 solutions containing Ce or Nd salts at 90 deg. C, then were dried and anodized. The contents of Ce or Nd in the anodic films were from 0.5% to 0.9%, and about 4-5% Ni was also introduced in the films. The modified anodic films were more compact with much smaller pores and increased hardness. In neutral, acidic and basic NaCl solutions, the rare earth modified films showed obviously improved corrosion resistance. The Ce modified films showed better corrosion resistance than Nd modified films. The cracking resistance of the films under heating was also improved.

Deposition and characterization of TaAIN thin films by reactive magnetron sputtering; Deposicao e caracterizacao de filmes finos de TaAIN depositados por magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Oliveira, G.B.; Fernandez, D.R.; Fontes Junior, A.S.; Felix, L.C.; Tentardini, E.K. [Universidade Federal de Sergipe (UFS), Sao Cristovao, SE (Brazil). Departamento de Ciencia e Engenharia de Materiais; Hubler, R. [Pontificia Universidade Catolica do Rio Grande do Sul (PUC-RS), RS (Brazil); Silva Junior, A.H. da, E-mail: brito-g@hotmail.com [Universidade Federal do Rio Grande do Sul (UFRGS), RS (Brazil)

2016-07-01

Phase stability, oxidation resistance and great mechanical properties are the main objectives when synthesizing protective coatings. The tantalum nitride (TaN) has aroused interest because of its high temperature stability, chemical inertness and thermal conductivity. However, it has a low hardness value when compared to other coatings. Researches has shown that one way to improvements in the properties of a thin film is by adding other elements in the deposition process. Therefore, the objective of this study was to deposit thin films of TaAlN by magnetron sputtering, changing the aluminum concentration of 2, 5, 7, to 14%. Then the coatings were characterized by EDS, RBS, GIXRD and nanohardness. In this study was found that the aluminum deposited did not change the oxidation resistance of the coating, and the highest value of hardness was 28 GPa for the sample with 14 at.%. (author)

A novel basalt fiber-reinforced polylactic acid composite for hard tissue repair.

Science.gov (United States)

Chen, Xi; Li, Yan; Gu, Ning

2010-08-01

A basalt fiber (BF) was, for the first time, introduced into a poly(l-lactic acid) (PLLA) matrix as innovative reinforcement to fabricate composite materials for hard tissue repair. Firstly, BF/PLLA composites and pure PLLA were produced by the methods of solution blending and freeze drying. The results showed that basalt fibers can be uniformly dispersed in the PLLA matrix and significantly improve the mechanical properties and hydrophilicity of the PLLA matrix. The presence of basalt fibers may retard the polymer degradation rate and neutralize the acid degradation from PLLA. Osteoblasts were cultured in vitro to evaluate the cytocompatibility of the composite. An MTT assay revealed that osteoblasts proliferated well for 7 days and there was little difference found in their viability on both PLLA and BF/PLLA films, which was consistent with the alkaline phosphatase (ALP) activity results. A fluorescent staining observation showed that osteoblasts grew well on the composites. SEM images displayed that osteoblasts tended to grow along the fiber axis. The formation of mineralized nodules was observed on the films by Alizarin red S staining. These results suggest that the presence of basalt fibers does not noticeably affect osteoblastic behavior and the designed composites are osteoblast compatible. It is concluded that basalt fibers, as reinforcing fibers, may have promising applications in hard tissue repair.

A novel basalt fiber-reinforced polylactic acid composite for hard tissue repair

International Nuclear Information System (INIS)

Chen Xi; Li Yan; Gu Ning

2010-01-01

A basalt fiber (BF) was, for the first time, introduced into a poly(l-lactic acid) (PLLA) matrix as innovative reinforcement to fabricate composite materials for hard tissue repair. Firstly, BF/PLLA composites and pure PLLA were produced by the methods of solution blending and freeze drying. The results showed that basalt fibers can be uniformly dispersed in the PLLA matrix and significantly improve the mechanical properties and hydrophilicity of the PLLA matrix. The presence of basalt fibers may retard the polymer degradation rate and neutralize the acid degradation from PLLA. Osteoblasts were cultured in vitro to evaluate the cytocompatibility of the composite. An MTT assay revealed that osteoblasts proliferated well for 7 days and there was little difference found in their viability on both PLLA and BF/PLLA films, which was consistent with the alkaline phosphatase (ALP) activity results. A fluorescent staining observation showed that osteoblasts grew well on the composites. SEM images displayed that osteoblasts tended to grow along the fiber axis. The formation of mineralized nodules was observed on the films by Alizarin red S staining. These results suggest that the presence of basalt fibers does not noticeably affect osteoblastic behavior and the designed composites are osteoblast compatible. It is concluded that basalt fibers, as reinforcing fibers, may have promising applications in hard tissue repair.

Effects of ion irradiation on the mechanical properties of SiNa wO xC yH z sol-gel derived thin films

Science.gov (United States)

Lucca, D. A.; Qi, Y.; Harriman, T. A.; Prenzel, T.; Wang, Y. Q.; Nastasi, M.; Dong, J.; Mehner, A.

2010-10-01

A study of the effects of ion irradiation of hybrid organic/inorganic modified silicate thin films on their mechanical properties is presented. NaOH catalyzed SiNa wO xC yH z thin films were synthesized by sol-gel processing from tetraethylorthosilicate (TEOS) and methyltriethoxysilane (MTES) precursors and spin-coated onto Si substrates. After drying at 300 °C, the films were irradiated with 125 keV H + or 250 keV N 2+ at fluences ranging from 1 × 10 14 to 2.5 × 10 16 ions/cm 2. Nanoindentation was used to characterize the films. Changes in hardness and reduced elastic modulus were examined as a function of ion fluence and irradiating species. The resulting increases in hardness and reduced elastic modulus are compared to similarly processed acid catalyzed silicate thin films.

Structural, mechanical, electrical and wetting properties of ZrNx films deposited by Ar/N2 vacuum arc discharge: Effect of nitrogen partial pressure

Science.gov (United States)

Abdallah, B.; Naddaf, M.; A-Kharroub, M.

2013-03-01

Non-stiochiometric zirconium nitride (ZrNx) thin films have been deposited on silicon substrates by vacuum arc discharge of (N2 + Ar) gas mixtures at different N2 partial pressure ratio. The microstructure, mechanical, electrical and wetting properties of these films are studied by means of X-ray diffraction (XRD), micro-Raman spectroscopy, Rutherford back scattering (RBS) technique, conventional micro-hardness testing, electrical resistivity, atomic force microscopy (AFM) and contact angle (CA) measurements. RBS results and analysis show that the (N/Zr) ratio in the film increases with increasing the N2 partial pressure. A ZrNx film with (Zr/N) ratio in the vicinity of stoichiometric ZrN is obtained at N2 partial pressure of 10%. XRD and Raman results indicate that all deposited films have strained cubic crystal phase of ZrN, regardless of the N2 partial pressure. On increasing the N2 partial pressure, the relative intensity of (1 1 1) orientation with respect to (2 0 0) orientation is seen to decrease. The effect of N2 partial pressure on micro-hardness and the resistivity of the deposited film is revealed and correlated to the alteration of grain size, crystallographic texture, stoichiometry and residual stress developed in the film. In particular, it is found that residual stress and nitrogen incorporation in the film play crucial role in the alteration of micro-hardness and resistivity respectively. In addition, CA and AFM results demonstrate that as N2 partial pressure increases, both the surface hydrophobicity and roughness of the deposited film increase, leading to a significant decrease in the film surface free energy (SFE).

Effect of UV-irradiation on sol-gel optical films

International Nuclear Information System (INIS)

Yang Fan; Shen Jun; Zhou Bin; Wu Guangming; Luo Aiyun; Sun Qi

2005-01-01

Sol-gel optical films were deposited on K9 glass and silicon wafer substrates by spin-coating method and a high-pressure mercury lamp was used to perform ultraviolet treating to solidify these films and improve their performance. SEM, AFM, IR and ellipsometer were used to characterize the structure and optical properties of the films. Mechanical property of films was measured by pencil hardness-testing device. Laser damage threshold of films was measured by a Q-switched Nd:YAG high power laser with the wave length of 1064 nm and the pulse width of 15 ns. The results show that UV-irradiation can improve the mechanical property and increase the refractive index of the films. Besides, the nodules on the surface of the films can be changed into pits by UV-irradiation process, so the laser damage threshold of sol-gel thin films will be increased. After UV-irradiation the laser damage threshold of single-layer ZrO 2 film reached 50.6 J/cm 2 (1064 nm, 1 ns). It is found that UV-irradiation is an effective method to avoid the infiltrating between the layers, and the degree of homogeneity of the multilayer films can be improved by this way. (authors)

Chemically stabilized epitaxial wurtzite-BN thin film

Science.gov (United States)

Vishal, Badri; Singh, Rajendra; Chaturvedi, Abhishek; Sharma, Ankit; Sreedhara, M. B.; Sahu, Rajib; Bhat, Usha; Ramamurty, Upadrasta; Datta, Ranjan

2018-03-01

We report on the chemically stabilized epitaxial w-BN thin film grown on c-plane sapphire by pulsed laser deposition under slow kinetic condition. Traces of no other allotropes such as cubic (c) or hexagonal (h) BN phases are present. Sapphire substrate plays a significant role in stabilizing the metastable w-BN from h-BN target under unusual PLD growth condition involving low temperature and pressure and is explained based on density functional theory calculation. The hardness and the elastic modulus of the w-BN film are 37 & 339 GPa, respectively measured by indentation along direction. The results are extremely promising in advancing the microelectronic and mechanical tooling industry.

Protein gradient films of fibroin and gelatine.

Science.gov (United States)

Claussen, Kai U; Lintz, Eileen S; Giesa, Reiner; Schmidt, Hans-Werner; Scheibel, Thomas

2013-10-01

Gradients are a natural design principle in biological systems that are used to diminish stress concentration where materials of differing mechanical properties connect. An interesting example of a natural gradient material is byssus, which anchors mussels to rocks and other hard substrata. Building upon previous work with synthetic polymers and inspired by byssal threads, protein gradient films are cast using glycerine-plasticized gelatine and fibroin exhibiting a highly reproducible and smooth mechanical gradient, which encompasses a large range of modulus from 160 to 550 MPa. The reproducible production of biocompatible gradient films represents a first step towards medical applications. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Excellent durability of DLC film on carburized steel (JIS-SCr420) under a stress of 3.0 GPa

International Nuclear Information System (INIS)

Yakabe, F; Kumagai, M; Kuwahara, H; Ochiai, S; Jinbo, Y; Horiuchi, T

2008-01-01

To improve durability of transmission gears, Diamond Like Carbon (DLC) film coated on roller was estimated as well as TiN film. These films were coated on JIS-SCr420 steel, which was carburized, quenched, and tempered. DLC and TiN films were deposited by PCVD and PVD process, respectively. These surface modified rollers were estimated by usual metallurgical methods (observation of microstructure by optical microscope, SEM, and TEM, measurement of hardness by Vickers hardness tester and nano-indentator), measurement of friction coefficient by ball-on-disk in dry atmosphere, analysis of carbon by Raman spectroscopy and hydrogen by EDRA, and lifetime of pitting by the roller-pitting test. The hardness values were 21 GPa and 26 GPa, the elasticity coefficients were 192 GPa and 336 GPa, the friction coefficients were 0.1∼0.15 and 0.5∼0.6 for DLC and TiN films, respectively. The present DLC was a typical DLC called as hydrogenated amorphous carbon (a-C: H). The hydrogen content was about 20%. The surface fatigue resistance of DLC-coated specimen had 100 times longer life than that the carburized and quenched one even under Hertzian contact stress of 3.0 GPa. TiN coated specimen was failed at 3.0 GPa by 5.17·10 5 cycles despite that the strength of the surface of the substrate was reduced due to the exposure at higher temperature in the coating process than the temperature for tempering

Influence of ion bombardment on structure and properties of TiZrN thin film

Energy Technology Data Exchange (ETDEWEB)

Lin, Yu-Wei, E-mail: james722@itrc.narl.org.tw [Instrument Technology Research Center, National Applied Research Laboratories Taiwan (China); Huang, Jia-Hong; Yu, Ge-Ping [Department of Engineering and System Science, National Tsing Hua University, Taiwan (China); Hsiao, Chien-Nan; Chen, Fong-Zhi [Instrument Technology Research Center, National Applied Research Laboratories, Taiwan (China)

2015-11-01

Highlights: • (Ti,Zr)N thin films were produced using dual guns with Ti and Zr targets. • Ti{sub 0.5}Zr{sub 0.5}N shows excellent hardness of 37.8 GPa with exhibiting (1 1 1) preferred orientation. • Resistivity is inverse proportional to the packing density. • Hardness is proportional to the packing density. - Abstract: The study is focused on the characterization of TiZrN thin film by controlling the behavior of ion bombardment. Thin films are grown using radio frequency magnetron sputtering process on Si wafer. The negative bias voltage ranging from −20 V to −130 V was applied to the substrate. The ion current density increases rapidly as substrate bias is lower than −60 V, then slightly increases as the critical value about −60 V is exceeded. At the substrate bias of −60 V, the ion current density is close to 0.56 mA/cm{sup 2}. The resistivity measured by four-point probe decreases from conditions −20 V to −60 V and then increases for substrate bias increases from −60 V to −130 V. The resistivity of TiZrN films is contributed from the packing factor. The N/TiZr ratios about 1 were measured by Rutherford backscattering spectrometer, and the packing factors of TiZrN films can also be obtained by the results of RBS. Field Emission scanning electron microscope (FEG-SEM) is used to characterize the thickness and structure of the deposited TiZrN film. X-ray diffraction (XRD) is used to determine the preferred orientation and lattice parameter. The precursor results of XRD show that all the coating samples exhibited (1 1 1) preferred orientation, and the hardness values of TiZrN films were ranging from 20 to 40 GPa. To sum up the precursor studies, the TiZrN films which can improve the properties from TiN and ZrN is a new ceramic material with higher potential. Following the advance process and analysis research, the structure and properties can be correlated and as a reference for industry application.

Magnetic and structural properties of NdFeB thin film prepared by step annealing

International Nuclear Information System (INIS)

Serrona, Leo K.E.B.; Sugimura, A.; Fujisaki, R.; Okuda, T.; Adachi, N.; Ohsato, H.; Sakamoto, I.; Nakanishi, A.; Motokawa, M.

2003-01-01

The crystallization of the amorphous phase into the tetragonal Nd 2 Fe 14 B (PHI) phase and the corresponding changes in magnetic properties have been examined by step annealing experiment using a 2 μm thick NdFeB film sample. Microstructural and magnetic analysis indicate that the film was magnetically soft as deposited with the coercivity H ciperp -1 and the remnant magnetization 4πM rperp -1 was developed and diffraction analysis showed evidence of PHI phase 002l peaks being aligned perpendicular to the film plane. At an optimum annealing temperature of 575 deg. C, the remnant magnetization of this anisotropic thin film is around 0.60 T with intrinsic coercivity of ∼1340 kA m -1 . Annealing the film sample at 200 deg. C≤T ann ≤750 deg. C showed variations in magnetic properties that were mostly due to the change in the perpendicular anisotropy. Based on 4πM sperpendicular values plotted against T ann , a dip in 4πM sperpendicular values was observed as T ann increased in the soft-to-hard magnetic characteristics transition region and rose as the hard crystalline phase started to form. The results show that the magnetic properties of the NdFeB film were slightly influenced by the presence of NdO, film surface roughening and the small increase in crystal size as a consequence of repeated heat treatment. At T ann ∼300 deg. C, the nominal saturation magnetization indicated a certain degree of weak perpendicular magnetic anisotropy in the film sample considered to be essential in the enhancement of coercivity in crystallized films

Comparison of mechanical behavior of TiN, TiNC, CrN/TiNC, TiN/TiNC films on 9Cr18 steel by PVD

Science.gov (United States)

Feng, Xingguo; Zhang, Yanshuai; Hu, Hanjun; Zheng, Yugang; Zhang, Kaifeng; Zhou, Hui

2017-11-01

TiN, TiNC, CrN/TiNC and TiN/TiNC films were deposited on 9Cr18 steel using magnetron sputtering technique. The morphology, composition, chemical state and crystalline structure of the films were observed and analyzed by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and scanning electron microscopy (SEM). Hardness and adhesion force were tested by nanoindentation and scratch tester, respectively. The friction and wear behavior of TiN, TiNC, CrN/TiNC and TiN/TiNC films sliding against GCr15 balls were investigated and compared synthetically using ball-on-disk tribometer. It was found that Tisbnd N, Tisbnd C, Tisbnd Nsbnd C and Csbnd C bonds were formed. The TiN/TiNC film was composed of TiN, TiC and TiNC phases. Hardness and adhesion force results indicated that although the TiN film possessed the highest hardness, its adhesion force was lowest among all the films. Tribological test results showed that the friction coefficient of TiN/TiNC was much lower than that of TiN and the wear rate decreases remarkably from 2.3 × 10-15 m3/Nm to 7.1 × 10-16 m3/Nm, which indicated the TiN/TiNC film has better wear resistance.

He+ irradiation temperature influence on the structure and nanohardness of hydrocarbon films

International Nuclear Information System (INIS)

Fan, Hongyu; Yang, Deming; Sun, Li; Yang, Qi; Niu, Jinhai; Guo, Liping; Chen, Jihong; Bi, Zhenhua; Liu, Dongping

2013-01-01

Polymer-like hydrocarbon films were irradiated with 100 keV He + or annealed at sample temperatures varying from 25 to 600 °C. The effects of sample temperature on the structure and nanohardness of hydrocarbon films are investigated by atomic force microscopy (AFM), AFM-based nanoindentation, Fourier transform infrared spectroscopy, and Raman spectroscopy. Analysis shows that annealing results in the decrease in the nanohardness of hydrocarbon films from 4.0 GPa to 0.55 GPa while He + irradiation at an elevated sample temperature results in the formation of dense diamond-like carbon films with nanohardness up to 20.0 GPa. This indicates that polymer-like hydrocarbon films can be transformed into the hard diamond-like carbon films with a relatively low H content on vacuum vessels of fusion devices due to the energetic bombardments at an elevated wall temperature

Quantitative characterization of silicon- and aluminium oxynitride films produced by reactive dc-magnetron sputtering

International Nuclear Information System (INIS)

Dreer, S.

2000-05-01

The deposition of aluminum and silicon oxynitride films by reactive dc-magnetron sputtering was systematically planned by design of experiments, carried out and evaluated with the application of specialized statistics software. The influence of the deposition parameters on the resulting films was evaluated by multiple regression analysis. With the obtained data a model of the deposition process for the quantitative prediction of the deposition parameters necessary to obtain films with desired composition was built. This is also of technological importance, since the physical properties of the films strongly depend on their composition. Furthermore, the long term repeatability of the deposition process was implemented into the model. A precise and economic way for quantitative bulk analysis of silicon/aluminum, oxygen and nitrogen based on EPMA was presented and the use of data gained by the latter method is discussed for the calculation of relative sensitivity factors for SIMS and hf-SNMS. Advantages and disadvantages of SIMS, hf-SNMS, hf-GD-OES, and sputter AES were compared. The combination FT-IR/EPMA/SIMS at present offers the best possibility for a quantitative bulk and in depth distribution analysis of such films in the range of 20 to 1000 nm thickness. The films were also characterized by XRD and PAA. The refractive index and the growth rate of the films were determined by spectroscopic ellipsometry. With indentation by a nano hardness tester the hardness and the Young's modulus of the films were obtained. The results of these measurements were evaluated by statistical software. The dependencies of the physical properties on the deposition parameters and on the film thickness were evaluated and quantified. Furthermore, the dependencies of the physical properties on the film composition represented by the oxygen content were evaluated. (author)

Amorphous hydrogenated carbon films treated by SF{sub 6} plasma

Energy Technology Data Exchange (ETDEWEB)

Marins, N M S; Mota, R P; Santos, D C R; Honda, R Y; Kayama, M E; Kostov, K G; Algatti, M A [Laboratorio de Plasma, Faculdade de Engenharia, UNESP, Av. Dr. Ariberto Pereira da Cunha-333, 12516-410, Guaratingueta, SP (Brazil); Cruz, N C; Rangel, E C, E-mail: nazir@feg.unesp.b [Laboratorio de Plasmas Tecnologicos, Unidade Diferenciada Sorocaba/Ipero, UNESP, Av. Tres de Marco-511, 18085-180, Sorocaba, SP (Brazil)

2009-05-01

This work was performed to verify the chemical structure, mechanical and hydrophilic properties of amorphous hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition, using acetylene/argon mixture as monomer. Films were prepared in a cylindrical quartz reactor, fed by 13.56 MHz radiofrequency. The films were grown during 5 min, for power varying from 25 to 125 W at a fixed pressure of 9.5 Pa. After deposition, all samples were treated by SF{sub 6} plasma with the aim of changing their hydrophilic character. Film chemical structure investigated by Raman spectroscopy, revealed the increase of sp{sup 3} hybridized carbon bonds as the plasma power increases. Hardness measurements performed by the nanoindentation technique showed an improvement from 5 GPa to 14 GPa following the increase discharge power. The untreated films presented a hydrophilic character, which slightly diminished after SF{sub 6} plasma treatment.

A physicochemical study of sugar palm (Arenga Pinnata) starch films plasticized by glycerol and sorbitol

Science.gov (United States)

Poeloengasih, Crescentiana D.; Pranoto, Yudi; Hayati, Septi Nur; Hernawan, Rosyida, Vita T.; Prasetyo, Dwi J.; Jatmiko, Tri H.; Apriyana, Wuri; Suwanto, Andri

2016-02-01

The present work explores the physicochemical characteristics of sugar palm starch film for a potential hard capsule purpose. Sugar palm (Arenga pinnata) starch films were plasticized with glycerol or sorbitol in various concentrations (30% up to 50% w/w starch). Their effects on physicochemical properties of the films were investigated. The results showed that sugar palm starch was successfully developed as the main material of film using casting method. Incorporation of both glycerol or sorbitol affected the properties of films in different ways. It was found that thickness and solubility increased as plasticizer concentration increased, whereas retraction ratio, swelling degree and swelling thickness decreased with the increased plasticizer concentration.

Characterization of Films with Thickness Less than 10 nm by Sensitivity-Enhanced Atomic Force Acoustic Microscopy

Directory of Open Access Journals (Sweden)

Muraoka Mikio

2011-01-01

Full Text Available Abstract We present a method for characterizing ultrathin films using sensitivity-enhanced atomic force acoustic microscopy, where a concentrated-mass cantilever having a flat tip was used as a sensitive oscillator. Evaluation was aimed at 6-nm-thick and 10-nm-thick diamond-like carbon (DLC films deposited, using different methods, on a hard disk for the effective Young's modulus defined as E/(1 - ν2, where E is the Young's modulus, and ν is the Poisson's ratio. The resonant frequency of the cantilever was affected not only by the film's elasticity but also by the substrate even at an indentation depth of about 0.6 nm. The substrate effect was removed by employing a theoretical formula on the indentation of a layered half-space, together with a hard disk without DLC coating. The moduli of the 6-nm-thick and 10-nm-thick DLC films were 392 and 345 GPa, respectively. The error analysis showed the standard deviation less than 5% in the moduli.

Characterization of the Diamond-like Carbon Based Functionally Gradient Film

Institute of Scientific and Technical Information of China (English)

无

2002-01-01

Diamond-like carbon coatings have been used as solid lubricating coatings in vacuum technology for their goodphysical and chemical properties. In this paper, the hybrid technique of unbalanced magnetron sputtering and plasmaimmersion ion implantation (PIll) was adopted to fabricate diamond-like carbon-based functionally gradient film,N/TiN/Ti(N,C)/DLC, on the 304 stainless steel substrate. The film was characterized by using Raman spectroscopyand glancing X-ray diffraction (GXRD), and the topography and surface roughness of the film was observed usingAFM. The mechanical properties of the film were evaluated by nano-indentation. The results showed that the surfaceroughness of the film was approximately 0.732 nm. The hardness and elastic modulus, fracture toughness andinterfacial fracture toughness of N/TiN/Ti(N,C)/DLC functionally gradient film were about 19.84 GPa, 190.03 GPa,3.75 MPa.m1/2 and 5.68 MPa@m1/2, respectively. Compared with that of DLC monolayer and C/TiC/DLC multilayer,this DLC gradient film has better qualities as a solid lubricating coating.

Bond-orientational analysis of hard-disk and hard-sphere structures.

Science.gov (United States)

Senthil Kumar, V; Kumaran, V

2006-05-28

We report the bond-orientational analysis results for the thermodynamic, random, and homogeneously sheared inelastic structures of hard-disks and hard-spheres. The thermodynamic structures show a sharp rise in the order across the freezing transition. The random structures show the absence of crystallization. The homogeneously sheared structures get ordered at a packing fraction higher than the thermodynamic freezing packing fraction, due to the suppression of crystal nucleation. On shear ordering, strings of close-packed hard-disks in two dimensions and close-packed layers of hard-spheres in three dimensions, oriented along the velocity direction, slide past each other. Such a flow creates a considerable amount of fourfold order in two dimensions and body-centered-tetragonal (bct) structure in three dimensions. These transitions are the flow analogs of the martensitic transformations occurring in metals due to the stresses induced by a rapid quench. In hard-disk structures, using the bond-orientational analysis we show the presence of fourfold order. In sheared inelastic hard-sphere structures, even though the global bond-orientational analysis shows that the system is highly ordered, a third-order rotational invariant analysis shows that only about 40% of the spheres have face-centered-cubic (fcc) order, even in the dense and near-elastic limits, clearly indicating the coexistence of multiple crystalline orders. When layers of close-packed spheres slide past each other, in addition to the bct structure, the hexagonal-close-packed (hcp) structure is formed due to the random stacking faults. Using the Honeycutt-Andersen pair analysis and an analysis based on the 14-faceted polyhedra having six quadrilateral and eight hexagonal faces, we show the presence of bct and hcp signatures in shear ordered inelastic hard-spheres. Thus, our analysis shows that the dense sheared inelastic hard-spheres have a mixture of fcc, bct, and hcp structures.

Effect of arc suppression on the physical properties of low temperature dc magnetron sputtered tantalum thin films

International Nuclear Information System (INIS)

Subrahmanyam, A.; Valleti, Krishna; Joshi, Srikant V.; Sundararajan, G.

2007-01-01

Arcing is a common phenomenon in the sputtering process. Arcs and glow discharges emit electrons which may influence the physical properties of films. This article reports the properties of tantalum (Ta) thin films prepared by continuous dc magnetron sputtering in normal and arc-suppression modes. The substrate temperature was varied in the range of 300-673 K. The tantalum films were ∼1.8 μm thick and have good adherence to 316 stainless steel and single-crystal silicon substrates. The phase of the Ta thin film determines the electrical and tribological properties. The films deposited at 300 K using both methods were crystallized in a tetragonal structure (β phase) with a smooth surface (grain size of ∼10 nm) and exhibited an electrical resistivity of ∼194 μΩ cm and a hardness of ∼20 GPa. When the substrate temperature was 473 K and higher, the arc-suppression mode appears to influence the films to crystallize in the α phase with a grain size of ∼40 nm, whereas the normal power mode gave mixed phases β and α beyond 473 K, the arc-suppression mode yields larger grain sizes in the Ta thin films and the hardness decreases. These changes in the physical properties in arc-suppression mode are attributed to either the change in plasma characteristics or the energetic particle bombardment onto the substrate, or both

Mechanical Properties of Oxide Films on Electrolytic In-process Dressing (ELID) Copper-based Grinding Wheel

Science.gov (United States)

Kuai, J. C.; Wang, J. W.; Jiang, C. R.; Zhang, H. L.; Yang, Z. B.

2018-05-01

The mechanical properties of oxide films on copper based grinding wheel were studied by nanoindentation technique. The analysis of load displacement shows that the creep phenomenon occurs during the loading stage. Results show that the oxide film and the matrix have different characteristics, and the rigidity of the copper based grinding wheel is 0.6-1.3mN/nm, which is weaker than that of the matrix; the hardness of the oxide film is 2000-2300MPa, which is higher than the matrix; and the elastic modulus of the oxide film is 100-120GPa, also higher than the matrix.

Controlled delamination of metal films by hydrogen loading

Energy Technology Data Exchange (ETDEWEB)

Nikitin, Eugen

2008-11-18

n this work we quantitatively determine the adhesion energy between metal films and their substrates. Therefore a new controlled buckling technique is established, applying the strong compressive in-plane stress that results in thin films clamped on rigid substrates during hydrogen loading. When the elastic energy stored in the H-loaded thin film exceeds the adhesion energy between film and substrate, delamination occurs. At the onset of delamination, a critical hydrogen concentration, a critical stress value and a critical bending of the substrate are present, which are quantitative measures for the adhesion energy and permit its calculation. As the critical values are determined at the onset of delamination, plastic deformation is negligible, which denies the quantitative determination of adhesion energies in conventional test setups. In multilayer-systems, adhesion energies between substrates and films that hardly absorb hydrogen can be measured by the controlled buckling technique, when the films of interest are coated with hydrogen absorbing films (active layer). The measurements are performed easily and can be repeated under the same test conditions, while variables such as the thickness of the coating materials or the boundary surface structure can be varied and optimized. In this work the adhesion energies of different materials on polycarbonate and niobium on sapphire are investigated. (orig.)

Contribution of Adsorbed Protein Films to Nanoscopic Vibrations Exhibited by Bacteria Adhering through Ligand-Receptor Bonds.

Science.gov (United States)

Song, Lei; Sjollema, Jelmer; Norde, Willem; Busscher, Henk J; van der Mei, Henny C

2015-09-29

Bacteria adhering to surfaces exhibit nanoscopic vibrations that depend on the viscoelasticity of the bond. The quantification of the nanoscopic vibrations of bacteria adhering to surfaces provides new opportunities to better understand the properties of the bond through which bacteria adhere and the mechanisms by which they resist detachment. Often, however, bacteria do not adhere to bare surfaces but to adsorbed protein films, on which adhesion involves highly specific ligand-receptor binding next to nonspecific DLVO interaction forces. Here we determine the contribution of adsorbed salivary protein and fibronectin films to vibrations exhibited by adhering streptococci and staphylococci, respectively. The streptococcal strain used has the ability to adhere to adsorbed salivary proteins films through antigen I/II ligand-receptor binding, while the staphylococcal strain used adheres to adsorbed fibronectin films through a proteinaceous ligand-receptor bond. In the absence of ligand-receptor binding, electrostatic interactions had a large impact on vibration amplitudes of adhering bacteria on glass. On an adsorbed salivary protein film, vibration amplitudes of adhering streptococci depended on the film softness as determined by QCM-D and were reduced after film fixation using glutaraldehyde. On a relatively stiff fibronectin film, cross-linking the film in glutaraldehyde hardly reduced its softness, and accordingly fibronectin film softness did not contribute to vibration amplitudes of adhering staphylococci. However, fixation of the staphylococcus-fibronectin bond further decreased vibration amplitudes, while fixation of the streptococcus bond hardly impacted vibration amplitudes. Summarizing, this study shows that both the softness of adsorbed protein films and the properties of the bond between an adhering bacterium and an adsorbed protein film play an important role in bacterial vibration amplitudes. These nanoscopic vibrations reflect the viscoelasticity of the

Macroporous 'bubble' graphene film via template-directed ordered-assembly for high rate supercapacitors.

Science.gov (United States)

Chen, Cheng-Meng; Zhang, Qiang; Huang, Chun-Hsien; Zhao, Xiao-Chen; Zhang, Bing-Sen; Kong, Qing-Qiang; Wang, Mao-Zhang; Yang, Yong-Gang; Cai, Rong; Sheng Su, Dang

2012-07-21

A three-dimensional bubble graphene film, with controllable and uniform macropores and tailorable microstructure, was fabricated by a facile hard templating strategy and exhibit extraordinary electrochemical capacitance with high rate capability (1.0 V s(-1)).

Electronic properties of Nd2−xCexCuO4+δ: A hard X-ray photoemission investigation

International Nuclear Information System (INIS)

Guarino, A.; Panaccione, G.; Offi, F.; Monaco, G.; Fondacaro, A.; Torelli, P.; Fittipaldi, R.; Vecchione, A.; Pace, S.; Nigro, A.

2016-01-01

Highlights: • We grow and characterize Nd 2−x Ce x CuO 4+δ samples as thin film and single crystal. • We study the Cu 2p levels of our samples by hard X-ray photoemission spectroscopy. • We investigate bulk features of the Nd 2−x Ce x CuO 4+δ samples. • Signature of the bulk response is correlated with the crystallinity of the samples. - Abstract: Cu 2p core levels spectra measured by X-ray photoemission spectroscopy of selected as-grown Nd 2−x Ce x CuO 4+δ samples are presented and discussed. The presence of a satellite peak in the 2p core level of Nd 2−x Ce x CuO 4+δ single crystal by hard X-ray photoemission is confirmed in all non-superconducting samples, films and single crystals investigated in this work. The comparison of the spectral features of the different samples suggests that the presence and the intensity of this satellite peak is not related to the electric transport properties, but to the texture characteristics.

Comprehensive hard materials

CERN Document Server

2014-01-01

Comprehensive Hard Materials deals with the production, uses and properties of the carbides, nitrides and borides of these metals and those of titanium, as well as tools of ceramics, the superhard boron nitrides and diamond and related compounds. Articles include the technologies of powder production (including their precursor materials), milling, granulation, cold and hot compaction, sintering, hot isostatic pressing, hot-pressing, injection moulding, as well as on the coating technologies for refractory metals, hard metals and hard materials. The characterization, testing, quality assurance and applications are also covered. Comprehensive Hard Materials provides meaningful insights on materials at the leading edge of technology. It aids continued research and development of these materials and as such it is a critical information resource to academics and industry professionals facing the technological challenges of the future. Hard materials operate at the leading edge of technology, and continued res...

He{sup +} irradiation temperature influence on the structure and nanohardness of hydrocarbon films

Energy Technology Data Exchange (ETDEWEB)

Fan, Hongyu [School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600 (China); Yang, Deming [School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600 (China); School of Science, Changchun University of Science and Technology, Changchun, Jilin 130022 (China); Sun, Li [School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600 (China); School of Physics, Liaoning Normal University, Dalian 116023 (China); Yang, Qi; Niu, Jinhai [School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600 (China); Guo, Liping; Chen, Jihong [Accelerator Laboratory, School of Physics, Wuhan University, Wuhan 430072 (China); Bi, Zhenhua [School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600 (China); Liu, Dongping, E-mail: dongping.liu@dlnu.edu.cn [School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600 (China); Fujian Key Laboratory for Plasma and Magnetic Resonance, Department of Electronic Science, Aeronautics, School of Physics and Mechanical and Electrical Engineering, Xiamen University, Xiamen, Fujian 361005 (China)

2013-09-15

Polymer-like hydrocarbon films were irradiated with 100 keV He{sup +} or annealed at sample temperatures varying from 25 to 600 °C. The effects of sample temperature on the structure and nanohardness of hydrocarbon films are investigated by atomic force microscopy (AFM), AFM-based nanoindentation, Fourier transform infrared spectroscopy, and Raman spectroscopy. Analysis shows that annealing results in the decrease in the nanohardness of hydrocarbon films from 4.0 GPa to 0.55 GPa while He{sup +} irradiation at an elevated sample temperature results in the formation of dense diamond-like carbon films with nanohardness up to 20.0 GPa. This indicates that polymer-like hydrocarbon films can be transformed into the hard diamond-like carbon films with a relatively low H content on vacuum vessels of fusion devices due to the energetic bombardments at an elevated wall temperature.

Laser deposition of SnO2 thin films by continuous CO2 laser and their characterizations

International Nuclear Information System (INIS)

Kayed, K.; Awad, F.; Saiof, F.

2003-01-01

There are wide uses of tin oxide thin films, especially in the field of transparent conductors, solar cells, gas sensors and piezoelectric materials. Laser deposition is considered one of the most important techniques followed to obtain these films. In this research, we developed a technique to obtain homogeneous thin films of tin oxide depending on vaporization of pile targets of this oxide by continuous CO 2 laser in the atmosphere, with a fan which guarantees obtaining homogenous films. Some of these films were annealed in different conditions. The optical microscope images revealed the presence of high degree of homogeneity, while the x-ray study showed different crystallization grain orientations which depend on the preparation conditions. The preferred direction is (110). The optical absorption gives information about the value of the effective band gal for the samples before and after thermal annealing. We have found that some films E g =3.2 eV before annealing, and after long annealing they have E g =1.3 eV. In addition, the hard annealed thin films reveal anisotropy in the optical and electrical characteristics, they have different absorption coefficients in two perpendicular directions, also there is an electrical resistance anisotropy along these two directions especially after hard annealing. The E b was 0.73 eV before annealing, it became 0.37 eV for one direction and 0.32 eV for the other direction. (Authors)

Structural and mechanical properties of amorphous carbon films deposited by the dual plasma technique

Institute of Scientific and Technical Information of China (English)

Yaohui Wang; Xu Zhang; Xianying Wu; Huixing Zhang; Xiaoji Zhang

2008-01-01

Direct current metal filtered cathodic vacuum are (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylene gas on the microstructure and mechanical properties of the films were investigated. The results show that the phase of TiC in the (111) preferential crystallo-graphic orientation exists in the film, and rite main existing pattern of carbon is sp2. With increasing the acetylene flow rate, the con-tents of Ti and TiC phase of the film gradually reduce; however, the thickness of the film increases. When the substrate bias voltage reaches -600 V, the internal stress of the film reaches 1.6 GPa. The micro-hardness and elastic modulus of the film can reach 33.9 and 237.6 GPa, respectively, and the friction coefficient of the film is 0.25.

Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.

Science.gov (United States)

Teixeira, V; Soares, P; Martins, A J; Carneiro, J; Cerqueira, F

2009-07-01

Carbon based films can combine the properties of solid lubricating graphite structure and hard diamond crystal structure, i.e., high hardness, chemical inertness, high thermal conductivity and optical transparency without the crystalline structure of diamond. Issues of fundamental importance associated with nanocarbon coatings are reducing stress, improving adhesion and compatibility with substrates. In this work new nanocomposite coatings with improved toughness based in nanocrystalline phases of metals and ceramics embedded in amorphous carbon matrix are being developed within the frame of a research project: nc-MeNxCy/a-C(Me) with Me = Mo, Si, Al, Ti, etc. Carbide forming metal/carbon (Me/C) composite films with Me = Mo, W or Ti possess appropriate properties to overcome the limitation of pure DLC films. These novel coating architectures will be adopted with the objective to decrease residual stress, improve adherence and fracture toughness, obtain low friction coefficient and high wear-resistance. Nanocomposite DLC's films were deposited by hybrid technique using a PVD-Physically Vapor Deposition (magnetron sputtering) and Plasma Enhanced Chemical Vapor Deposition (PECVD), by the use of CH4 gas. The parameters varied were: deposition time, substrate temperature (180 degrees C) and dopant (Si + Mo) of the amorphous carbon matrix. All the depositions were made on silicon wafers and steel substrates precoated with a silicon inter-layer. The characterisation of the film's physico-mechanical properties will be presented in order to understand the influence of the deposition parameters and metal content used within the a-C matrix in the thin film properties. Film microstructure and film hybridization state was characterized by Raman Spectroscopy. In order to characterize morphology SEM and AFM will be used. Film composition was measured by Energy-Dispersive X-ray analysis (EDS) and by X-ray photoelectron spectroscopy (XPS). The contact angle for the produced DLC's on

Preparation of transparent Cu{sub 2}Y{sub 2}O{sub 5} thin films by RF magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Chiu, Te-Wei, E-mail: tewei@ntut.edu.tw; Chang, Chih-Hao; Yang, Li-Wei; Wang, Yung-Po

2015-11-01

Highlights: • Cu{sub 2}Y{sub 2}O{sub 5} thin films were prepared by RF magnetron sputtering. • Cu{sub 2}Y{sub 2}O{sub 5} thin films have high transmittance and antibacterial properties. • Mechanical properties of Cu{sub 2}Y{sub 2}O{sub 5} thin films were investigated. - Abstract: Cu{sub 2}Y{sub 2}O{sub 5} thin films were deposited on non-alkali glass substrates by RF magnetron sputtering. Its crystal structure, microstructure, optical property, mechanical property, and antibacterial activity were investigated by grazing-incidence X-ray diffraction, transmittance spectra, nanoindenter, and antibiotics test, respectively. A single-phase of Cu{sub 2}Y{sub 2}O{sub 5} was obtained while annealing at 700 °C in air and its optical transparency was >80% in the visible region. The hardness and elastic modulus of the film were 6.7 GPa and 82 GPa, respectively. Antibiotics testing result revealed that Cu{sub 2}Y{sub 2}O{sub 5} surface had a superior antibacterial performance even at a dark environment. Therefore, Cu{sub 2}Y{sub 2}O{sub 5} is a promising novel transparent antibacterial hard coating material.

A comparative study on microstructure and tribological properties of Si3N4 and TiN thin films produced by IBED method

International Nuclear Information System (INIS)

Zhuang Daming; Liu Jiajun; Zhu Baoliang; Li Wenzhi; Zhang Xushou; Yang Shengrong

1995-01-01

In this paper, the tribological properties of Si 3 N 4 and TiN thin films produced by ion beam enhanced deposition (IBED) method were compared on an SRV friction and wear testing machine. In order to understand the reasons of their excellent properties the microstructure, microhardness and bonding strength with the substrate were analysed by SEM, X-ray diffraction, Knoop hardness test and scratching test methods separately. The results show that the TiN(1) films exhibits the best tribological properties, which are closely related with its higher hardness and bonding strength. (author)

Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition

International Nuclear Information System (INIS)

Manis-Levy, Hadar; Mintz, Moshe H.; Livneh, Tsachi; Zukerman Ido; Raveh, Avi

2014-01-01

The effect of radio-frequency (RF) or low-frequency (LF) bias voltage on the formation of amorphous hydrogenated carbon (a-C:H) films was studied on silicon substrates with a low methane (CH 4 ) concentration (2–10 vol.%) in CH 4 +Ar mixtures. The bias substrate was applied either by RF (13.56 MHz) or by LF (150 kHz) power supply. The highest hardness values (∼18–22 GPa) with lower hydrogen content in the films (∼20 at.%) deposited at 10 vol.% CH 4 , was achieved by using the RF bias. However, the films deposited using the LF bias, under similar RF plasma generation power and CH 4 concentration (50 W and 10 vol.%, respectively), displayed lower hardness (∼6–12 GPa) with high hydrogen content (∼40 at.%). The structures analyzed by Fourier Transform Infrared (FTIR) and Raman scattering measurements provide an indication of trans-polyacetylene structure formation. However, its excessive formation in the films deposited by the LF bias method is consistent with its higher bonded hydrogen concentration and low level of hardness, as compared to the film prepared by the RF bias method. It was found that the effect of RF bias on the film structure and properties is stronger than the effect of the low-frequency (LF) bias under identical radio-frequency (RF) powered electrode and identical PECVD (plasma enhanced chemical vapor deposition) system configuration. (plasma technology)

Properties of Wide-dose-range GafChromic Films for Synchrotron Radiation Facility

International Nuclear Information System (INIS)

Nariyama, Nobuteru

2007-01-01

GafChromic films have been used at SPring-8 to detect the intensively irradiated parts and protect them from damage by being covered with shield or moved. To extend the usable dose range more widely, a new type of sensitive film EBT was investigated for the introduction. Calibration curves were obtained irradiated with 60Co γ rays and compared with those of other GafChromic films. For the application, these films were set in the white x-ray hutch and the dose distribution was measured. Ratio of doses given by EBT and XT-R indicated the degree of the photon spectrum hardness, which depended on the positions. As a result, dose range from 50 mGy to 300 kGy became available for dose distribution measurements, and a set of films having different energy responses was found to give information of photon spectra

Structural, chemical and nanomechanical investigations of SiC/polymeric a-C:H films deposited by reactive RF unbalanced magnetron sputtering

Science.gov (United States)

Tomastik, C.; Lackner, J. M.; Pauschitz, A.; Roy, M.

2016-03-01

Amorphous carbon (or diamond-like carbon, DLC) films have shown a number of important properties usable for a wide range of applications for very thin coatings with low friction and good wear resistance. DLC films alloyed with (semi-)metals show some improved properties and can be deposited by various methods. Among those, the widely used magnetron sputtering of carbon targets is known to increase the number of defects in the films. Therefore, in this paper an alternative approach of depositing silicon-carbide-containing polymeric hydrogenated DLC films using unbalanced magnetron sputtering was investigated. The influence of the C2H2 precursor concentration in the deposition chamber on the chemical and structural properties of the deposited films was investigated by Raman spectroscopy, X-ray photoelectron spectroscopy and elastic recoil detection analysis. Roughness, mechanical properties and scratch response of the films were evaluated with the help of atomic force microscopy and nanoindentation. The Raman spectra revealed a strong correlation of the film structure with the C2H2 concentration during deposition. A higher C2H2 flow rate results in an increase in SiC content and decrease in hydrogen content in the film. This in turn increases hardness and elastic modulus and decreases the ratio H/E and H3/E2. The highest scratch resistance is exhibited by the film with the highest hardness, and the film having the highest overall sp3 bond content shows the highest elastic recovery during scratching.

Deposition and characterization of TaAIN thin films by reactive magnetron sputtering

International Nuclear Information System (INIS)

Oliveira, G.B.; Fernandez, D.R.; Fontes Junior, A.S.; Felix, L.C.; Tentardini, E.K.; Silva Junior, A.H. da

2016-01-01

Phase stability, oxidation resistance and great mechanical properties are the main objectives when synthesizing protective coatings. The tantalum nitride (TaN) has aroused interest because of its high temperature stability, chemical inertness and thermal conductivity. However, it has a low hardness value when compared to other coatings. Researches has shown that one way to improvements in the properties of a thin film is by adding other elements in the deposition process. Therefore, the objective of this study was to deposit thin films of TaAlN by magnetron sputtering, changing the aluminum concentration of 2, 5, 7, to 14%. Then the coatings were characterized by EDS, RBS, GIXRD and nanohardness. In this study was found that the aluminum deposited did not change the oxidation resistance of the coating, and the highest value of hardness was 28 GPa for the sample with 14 at.%. (author)

Altering properties of cerium oxide thin films by Rh doping

International Nuclear Information System (INIS)

Ševčíková, Klára; Nehasil, Václav; Vorokhta, Mykhailo; Haviar, Stanislav; Matolín, Vladimír

2015-01-01

Highlights: • Thin films of ceria doped by rhodium deposited by RF magnetron sputtering. • Concentration of rhodium has great impact on properties of Rh–CeO x thin films. • Intensive oxygen migration in films with low concentration of rhodium. • Oxygen migration suppressed in films with high amount of Rh dopants. - Abstract: Ceria containing highly dispersed ions of rhodium is a promising material for catalytic applications. The Rh–CeO x thin films with different concentrations of rhodium were deposited by RF magnetron sputtering and were studied by soft and hard X-ray photoelectron spectroscopies, Temperature programmed reaction and X-ray powder diffraction techniques. The sputtered films consist of rhodium–cerium mixed oxide where cerium exhibits a mixed valency of Ce 4+ and Ce 3+ and rhodium occurs in two oxidation states, Rh 3+ and Rh n+ . We show that the concentration of rhodium has a great influence on the chemical composition, structure and reducibility of the Rh–CeO x thin films. The films with low concentrations of rhodium are polycrystalline, while the films with higher amount of Rh dopants are amorphous. The morphology of the films strongly influences the mobility of oxygen in the material. Therefore, varying the concentration of rhodium in Rh–CeO x thin films leads to preparing materials with different properties

Hydrogen doped thin film diamond. Properties and application for electronic devices

International Nuclear Information System (INIS)

Looi, H.J.

2000-01-01

The face centered cubic allotrope of carbon, diamond, is a semiconducting material which possesses a valuable combination of extreme properties such as super-hardness, highest thermal conductivity, chemical hardness, radiation hardness, wide bandgap and others. Advances in chemical vapour deposition (CVD) technology have lead to diamond becoming available in previously unattainable forms for example over large areas and with controllable purity. This has generated much research interest towards developing the knowledge and processing technology that would be necessary to fully exploit these extreme properties. Electronic devices fabricated on oxidised boron doped polycrystalline CVD diamond (PCD) displayed very poor and inconsistent characteristic. As a result, many electronic applications of polycrystalline diamond films were confined to ultra-violet (UV) and other forms of device which relied on the high intrinsic resistivity on undoped diamond films. If commercially accessible PCD films are to advance in areas which involve sophisticated electronic applications or to compete with existing semiconductors, the need for a more reliable and fully ionised dopant is paramount. This thesis describes a unique dopant discovered within the growth surface of PCD films. This dopant is related to hydrogen which arises during the growth of diamond films. The aim of this study is to characterise and identify possible applications for this form of dopant. The mechanism for carrier generation remains unknown and based on the experimental results in this work, a model is proposed. The Hall measurements conducted on this conductive layer revealed a p-type nature with promising properties for electronic device application. A more detail study based on electrical and surface science methods were carried out to identify the stability and operating conditions for this dopant. The properties of metal-semiconductor contacts on these surfaces were investigated. The fundamental knowledge

Nanomechanical investigation of thin-film electroceramic/metal-organic framework multilayers

Science.gov (United States)

Best, James P.; Michler, Johann; Liu, Jianxi; Wang, Zhengbang; Tsotsalas, Manuel; Maeder, Xavier; Röse, Silvana; Oberst, Vanessa; Liu, Jinxuan; Walheim, Stefan; Gliemann, Hartmut; Weidler, Peter G.; Redel, Engelbert; Wöll, Christof

2015-09-01

Thin-film multilayer stacks of mechanically hard magnetron sputtered indium tin oxide (ITO) and mechanically soft highly porous surface anchored metal-organic framework (SURMOF) HKUST-1 were studied using nanoindentation. Crystalline, continuous, and monolithic surface anchored MOF thin films were fabricated using a liquid-phase epitaxial growth method. Control over respective fabrication processes allowed for tuning of the thickness of the thin film systems with a high degree of precision. It was found that the mechanical indentation of such thin films is significantly affected by the substrate properties; however, elastic parameters were able to be decoupled for constituent thin-film materials (EITO ≈ 96.7 GPa, EHKUST-1 ≈ 22.0 GPa). For indentation of multilayer stacks, it was found that as the layer thicknesses were increased, while holding the relative thickness of ITO and HKUST-1 constant, the resistance to deformation was significantly altered. Such an observation is likely due to small, albeit significant, changes in film texture, interfacial roughness, size effects, and controlling deformation mechanism as a result of increasing material deposition during processing. Such effects may have consequences regarding the rational mechanical design and utilization of MOF-based hybrid thin-film devices.

Electrochemical and Antimicrobial Properties of Diamondlike Carbon-Metal Composite Films

Energy Technology Data Exchange (ETDEWEB)

MORRISON, M. L.; BUCHANAN, R. A.; LIAW, P. K.; BERRY, C. J.; BRIGMON, R.; RIESTER, L.; JIN, C.; NARAYAN, R. J.

2005-05-11

Implants containing antimicrobial metals may reduce morbidity, mortality, and healthcare costs associated with medical device-related infections. We have deposited diamondlike carbon-silver (DLC-Ag), diamondlike carbon-platinum (DLC-Pt), and diamondlike carbon-silver-platinum (DLC-AgPt) thin films using a multicomponent target pulsed laser deposition process. Transmission electron microscopy of the DLC-silver and DLC-platinum composite films revealed that the silver and platinum self-assemble into nanoparticle arrays within the diamondlike carbon matrix. The diamondlike carbon-silver film possesses hardness and Young's modulus values of 37 GPa and 331 GPa, respectively. The diamondlike carbon-metal composite films exhibited passive behavior at open-circuit potentials. Low corrosion rates were observed during testing in a phosphate-buffered saline (PBS) electrolyte. In addition, the diamondlike carbon-metal composite films were found to be immune to localized corrosion below 1000 mV (SCE). DLC-silver-platinum films demonstrated exceptional antimicrobial properties against Staphylococcus bacteria. It is believed that a galvanic couple forms between platinum and silver, which accelerates silver ion release and provides more robust antimicrobial activity. Diamondlike carbon-silver-platinum films may provide unique biological functionalities and improved lifetimes for cardiovascular, orthopaedic, biosensor, and implantable microelectromechanical systems.

Structure and Interfacial Tension of a Hard-Rod Fluid in Planar Confinement.

Science.gov (United States)

Brumby, Paul E; Wensink, Henricus H; Haslam, Andrew J; Jackson, George

2017-10-24

The structural properties and interfacial tension of a fluid of rodlike hard-spherocylinder particles in contact with hard structureless flat walls are studied by means of Monte Carlo simulation. The calculated surface tension between the rod fluid and the substrate is characterized by a nonmonotonic trend as a function of the bulk concentration (density) over the range of isotropic bulk concentrations. As suggested by earlier theoretical studies, a surface-ordering scenario is confirmed by our simulations: the local orientational order close to the wall changes from uniaxial to biaxial nematic when the bulk concentration reaches about 85% of the value at the onset of the isotropic-nematic phase transition. The surface ordering coincides with a wetting transition whereby the hard wall is wetted by a nematic film. Accurate values of the fluid-solid surface tension, the adsorption, and the average particle-wall contact distance are reported (over a broad range of densities into the dense nematic region for the first time), which can serve as a useful benchmark for future theoretical and experimental studies on confined rod fluids. The simulation data are supplemented with predictions from second-virial density functional theory, which are in good qualitative agreement with the simulation results.

Structure of ultrathin Pd films determined by low-energy electron microscopy and diffraction

Energy Technology Data Exchange (ETDEWEB)

Santos, B; De la Figuera, J [Centro de Microanalisis de Materiales, Universidad Autonoma de Madrid, Madrid 28049 (Spain); Puerta, J M; Cerda, J I [Instituto de Ciencia de Materiales, CSIC, Madrid 28049 (Spain); Herranz, T [Instituto de Quimica-Fisica ' Rocasolano' , CSIC, Madrid 28006 (Spain); McCarty, K F [Sandia National Laboratories, Livermore, CA 94550 (United States)], E-mail: benitosantos001@gmail.com

2010-02-15

Palladium (Pd) films have been grown and characterized in situ by low-energy electron diffraction (LEED) and microscopy in two different regimes: ultrathin films 2-6 monolayers (ML) thick on Ru(0001), and {approx}20 ML thick films on both Ru(0001) and W(110). The thinner films are grown at elevated temperature (750 K) and are lattice matched to the Ru(0001) substrate. The thicker films, deposited at room temperature and annealed to 880 K, have a relaxed in-plane lattice spacing. All the films present an fcc stacking sequence as determined by LEED intensity versus energy analysis. In all the films, there is hardly any expansion in the surface-layer interlayer spacing. Two types of twin-related stacking sequences of the Pd layers are found on each substrate. On W(110) the two fcc twin types can occur on a single substrate terrace. On Ru(0001) each substrate terrace has a single twin type and the twin boundaries replicate the substrate steps.

Nanostructured Zn and ZnO nanowire thin films for mechanical and self-cleaning applications

Energy Technology Data Exchange (ETDEWEB)

Shaik, Ummar Pasha [Advanced Centre of Research in High Energy Materials, University of Hyderabad, Prof. C R Rao Road, Gachibowli, Hyderabad 500046 (India); Purkayastha, Debarun Dhar, E-mail: ddebarun@yahoo.com [Department of Physics, National Institute of Technology Nagaland, Chumukedima, Dimapur 797103 (India); Krishna, M. Ghanashyam [Advanced Centre of Research in High Energy Materials, University of Hyderabad, Prof. C R Rao Road, Gachibowli, Hyderabad 500046 (India); School of Physics, University of Hyderabad, Prof. C R Rao Road, Gachibowli, Hyderabad 500046 (India); Madhurima, V. [Department of Physics, Central University of Tamil Nadu, Thiruvarur 610004 (India)

2015-03-01

Highlights: • Zn metal films were deposited by thermal evaporation, on various substrates. • Upon annealing Zn there is transformation of the Zn nanosheets into ZnO nanowires. • ZnO nanowires are superhydrophobic and exhibit wetting transition on UV exposure. • ZnO will be useful in self-cleaning, mechanical and oxidation resistance surfaces. - Abstract: Nanostructured Zn metal films were deposited by thermal evaporation, on borosilicate glass, Quartz, sapphire, lanthanum aluminate and yttria stabilized zirconia substrates. The as-deposited films are nanocrystalline and show a morphology that consists of triangular nanosheets. The films are hydrophobic with contact angles between 102° and 120° with hardness and Young's modulus between 0.15–0.8 GPa and 18–300 GPa, respectively. Thermal annealing of the films at 500 °C results only in partial oxidation of Zn to ZnO, which indicates good oxidation resistance. Annealing also causes transformation of the Zn nanosheets into ZnO nanowires that are polycrystalline in nature. The ZnO nanowires are superhydrophobic with contact angles between 159° and 162°, contact angle hysteresis between 5° and 10° and exhibit a reversible superhydrophobic–hydrophilic transition under UV irradiation. The nanowires are much softer than the as-deposited Zn metal films, with hardness between 0.02 and 0.4 GPa and Young's modulus between 3 and 35 GPa. The current study thus demonstrates a simple process for fabrication of nanostructured Zn metal films followed by a one-step transformation to nanowires with properties that will be very attractive for mechanical and self-cleaning applications.

Superhard carbon film deposition by means of Laser-Arco {sup registered} on the way from the laboratory into the industrial series coating; Abscheidung superharter Kohlenstoffschichten mittels Laser-Arco {sup registered} auf dem Weg vom Labor in die industrielle Serienfertigung

Energy Technology Data Exchange (ETDEWEB)

Scheibe, Hans-Joachim; Leonhardt, Michael; Leson, Andreas; Meyer, Carl-Friedrich; Stucky, Thomas; Weihnacht, Volker [Fraunhofer-Institut fuer Werkstoff- und Strahltechnik (IWS), Dresden (Germany)

2008-12-15

Diamond-like carbon films (DLC) are more and more applied as wear protection coatings for components and tools due to their unique combination of high hardness, low friction and sticking tendency to metallic counter bodies. Up to now applied DLC films are hydrogen containing (a-C:H) or metal carbon films (Me-C:H) deposited by a plasma assisted CVD process from carbon-hydrogen gas mixtures. Their wide industrial effort results from that the can be deposited with slowly modified coating machines for classical hard coating (e.g. TiN or CrN). A new generation DLC films are the hydrogen-free ta-C films (ta-C = tetrahedral bounded amorphous carbon) with a between two and three-times higher hardness and with a resulting higher wear resistance under extreme condition than classical DLC films. They have excellent emergency running properties at lubrication break down. Their industrial application is more difficult due to that they cannot deposited with modified coating machines for classical hard and DLC coating and a new technology with corresponding equipment was not available up to now. The laser controlled, pulsed arc deposition technology (Laser-Arco {sup registered}) of the Fraunhofer IWS Dresden has this potential. In kind of a Laser-Arc-Module-source the ta-C film deposition can be integrated in every industrial used deposition machine. (orig.)

Magnetic hysteresis of cerium doped bismuth ferrite thin films

International Nuclear Information System (INIS)

Gupta, Surbhi; Tomar, Monika; Gupta, Vinay

2015-01-01

The influence of Cerium doping on the structural and magnetic properties of BiFeO 3 thin films have been investigated. Rietveld refinement of X-ray diffraction data and successive de-convolution of Raman scattering spectra of Bi 1−x Ce x FeO 3 (BCFO) thin films with x=0–0.20 reflect the single phase rhombohedral (R3c) formation for x<0.08, whereas concentration-driven gradual structural phase transition from rhombohedral (R3c) to partial tetragonal (P4mm) phase follows for x≥0.08. All low wavenumber Raman modes (<300 cm −1 ) showed a noticeable shift towards higher wavenumber with increase in doping concentration, except Raman E-1 mode (71 cm −1 ), shows a minor shift. Sudden evolution of Raman mode at 668 cm −1 , manifested as A 1 -tetragonal mode, accompanied by the shift to higher wavenumber with increase in doping concentration (x) affirm partial structural phase transition. Anomalous wasp waist shaped (M–H) hysteresis curves with improved saturation magnetization (M s ) for BCFO thin films is attributed to antiferromagnetic interaction/hybridization between Ce 4f and Fe 3d electronic states. The contribution of both hard and soft phase to the total coercivity is calculated. Polycrystalline Bi 0.88 Ce 0.12 FeO 3 thin film found to exhibit better magnetic properties with M s =15.9 emu/g without any impure phase. - Highlights: • Synthesis of single phase Bi 1−x Ce x FeO 3 thin films with (x=0–0.2) on cost effective corning glass and silicon substrates using CSD technique. • Structural modification studies using Rietveld refinement of XRD and de-convolution of Raman spectra revealed partial phase transition from rhombohedral (R3c) to tetragonal (P4mm) phase. • Possible reasons for origin of pinched magnetic behavior of BCFO thin films are identified. • Contribution of both hard and soft magnetic phase in coercivity of BCFO thin films is calculated and practical applications of such materials exhibiting pinching behavior are conferred

Magnetic hysteresis of cerium doped bismuth ferrite thin films

Energy Technology Data Exchange (ETDEWEB)

Gupta, Surbhi [Department of Physics and Astrophysics, University of Delhi (India); Tomar, Monika [Physics Department, Miranda House, University of Delhi (India); Gupta, Vinay, E-mail: drguptavinay@gmail.com [Department of Physics and Astrophysics, University of Delhi (India)

2015-03-15

The influence of Cerium doping on the structural and magnetic properties of BiFeO{sub 3} thin films have been investigated. Rietveld refinement of X-ray diffraction data and successive de-convolution of Raman scattering spectra of Bi{sub 1−x}Ce{sub x}FeO{sub 3} (BCFO) thin films with x=0–0.20 reflect the single phase rhombohedral (R3c) formation for x<0.08, whereas concentration-driven gradual structural phase transition from rhombohedral (R3c) to partial tetragonal (P4mm) phase follows for x≥0.08. All low wavenumber Raman modes (<300 cm{sup −1}) showed a noticeable shift towards higher wavenumber with increase in doping concentration, except Raman E-1 mode (71 cm{sup −1}), shows a minor shift. Sudden evolution of Raman mode at 668 cm{sup −1}, manifested as A{sub 1}-tetragonal mode, accompanied by the shift to higher wavenumber with increase in doping concentration (x) affirm partial structural phase transition. Anomalous wasp waist shaped (M–H) hysteresis curves with improved saturation magnetization (M{sub s}) for BCFO thin films is attributed to antiferromagnetic interaction/hybridization between Ce 4f and Fe 3d electronic states. The contribution of both hard and soft phase to the total coercivity is calculated. Polycrystalline Bi{sub 0.88}Ce{sub 0.12}FeO{sub 3} thin film found to exhibit better magnetic properties with M{sub s}=15.9 emu/g without any impure phase. - Highlights: • Synthesis of single phase Bi{sub 1−x}Ce{sub x}FeO{sub 3} thin films with (x=0–0.2) on cost effective corning glass and silicon substrates using CSD technique. • Structural modification studies using Rietveld refinement of XRD and de-convolution of Raman spectra revealed partial phase transition from rhombohedral (R3c) to tetragonal (P4mm) phase. • Possible reasons for origin of pinched magnetic behavior of BCFO thin films are identified. • Contribution of both hard and soft magnetic phase in coercivity of BCFO thin films is calculated and practical

Induced anisotropy in amorphous Sm-Co sputtered films

International Nuclear Information System (INIS)

Chen, K.; Hegde, H.; Cadieu, F.J.

1992-01-01

The variation of the in-the-film-plane anisotropy constant, K u , with composition and the magnitude of the field, H s , applied in plane during the sputter deposition of amorphous Sm x Co 1-x , 0.08≤x≤0.40, thin films has been studied. We demonstrate here that with a large H s , 5.0 kOe, a well defined and large in-the-film-plane anisotropy can be obtained. An exceptionally high value of K u =3.3x10 6 erg/cm 3 has been obtained. For the loop measured along the in-plane hard direction, the opening of the loop was undetectable, and the loop along the easy axis was a perfect rectangle. For certain conditions, the anisotropy field measured perpendicular to the film plane when corrected for demagnetization (N d =4π) was the same as that for the in-plane measurements. It is concluded that surface induced short range ordering was the origin of the anisotropy observed in amorphous films deposited in a magnetic field. The formation mechanism is different from that of the short range ordering induced by field annealing

Nanodiamond particles/PVDF nanocomposite flexible films: thermal, mechanical and physical properties

Science.gov (United States)

Jaleh, Babak; Sodagar, Shima; Momeni, Amir; Jabbari, Ameneh

2016-08-01

Recently, polymer nanocomposites reinforced with nanoparticles have attracted a lot of attention due to their unique physical and mechanical properties. In this work, poly (vinylidene fluoride)/nanodiamond particles nanocomposite films were prepared by solution casting method with various nanodiamond particles contents. The samples were investigated by Fourier transform infrared spectroscopy and x-ray diffraction technique. The results revealed an obvious α to β-phase transformation compared to pure PVDF. The most (or the maximum) phase transformation from α to β-phase (>90%) was found for nanocomposite film with 8% wt nanodiamond particles. Scanning electron micrographs showed considerable decrease in the size of spherulitic crystal structure of PVDF with adding nanoparticles. The photoluminescence property of nanocomposite films was investigated by photoluminescence spectroscopy and the optical band gap value was calculated from the UV-visible absorption spectra. The results showed that after the incorporation of nanoparticles into PVDF, the value of optical band gap decreased. Thermal stability of samples was studied by thermogravimetric analysis. Due to an increase in the electroactive phase (β) percentage by adding nanoparticles, the resistance of samples to thermal degradation improved. The mechanical properties of samples were investigated by tensile test and hardness measurements. The elastic modulus and hardness of samples were enhanced by adding nanodiamond particles and elongation to fracture decreased.

High coercivity Sm-Co thin films from elemental Sm/Co multilayer deposition and their microstructural aspects

Energy Technology Data Exchange (ETDEWEB)

Krishnan, M. [Surface Engineering Division, CSIR-National Aerospace Laboratories, Bangalore 560 017 (India); Department of Physics, National Institute of Technology Calicut, Calicut 673601 (India); Predeep, P. [Department of Physics, National Institute of Technology Calicut, Calicut 673601 (India); Sridhara Rao, D.V. [Defence Metallurgical Research Laboratories, Hyderabad 500058 (India); Prajapat, C.L.; Singh, M.R. [Technical Physics Division, Bhabha Atomic Research Centre, Mumbai 400085 (India); Barshilia, Harish C. [Surface Engineering Division, CSIR-National Aerospace Laboratories, Bangalore 560 017 (India); Chowdhury, P., E-mail: pchowdhury@nal.res.in [Surface Engineering Division, CSIR-National Aerospace Laboratories, Bangalore 560 017 (India)

2017-05-15

Hard magnetic thin films with high coercivity were fabricated by magnetron sputtering on MgO(100) and quartz substrates. The films were grown by depositing sequentially Sm and Co layers at an elevated substrate temperature of 500 °C. Subsequent post-annealing was carried out at various temperatures in range of 500–700 °C to form Sm-Co hard magnetic thin films. X-ray diffraction studies revealed the formation of randomly oriented SmCo{sub 5} crystallites on quartz substrate, whereas, a textured growth of Sm{sub 2}Co{sub 7} with strong (110) crystalline phases was observed on MgO substrate. Microstructural analyses were carried out using Transmission Electron Microscopy (TEM) for samples grown on MgO substrate at 650 °C and inferred the presence of high density planar defects along with large grain boundaries. Further microdiffraction studies confirmed the presence of SmCo{sub 3} as an impurity phase in the films. Magnetic hysteresis measurements indicate the square hysteresis behaviors with high coercivity value of 3.1 T and 2.7 T for 650 °C annealed samples on both MgO and quartz substrates, respectively. The origin of such high coercivity value was then correlated with pinning type of spin reversal mechanism as confirmed through the analyses of demagnetization curves. The magnetic force microscopy images for films on MgO substrate, annealed at 650 °C, revealed the presence of magnetic domains with size higher than 1 µm. The formed magnetic domains lacked well defined boundaries indicating an enhanced exchange coupling between the grain clusters. - Highlights: • Ewald technique in micromagnetic simulations with periodic boundary conditions. • Effect of micromagnetic parameters on hysteresis in exchange spring magnets. • Importance of the interface exchange coupling for hard-soft nanocomposites. • Geometry dependence of the optimal soft phase size in exchange spring magnets.

Remember Hard but Think Softly: Metaphorical Effects of Hardness/Softness on Cognitive Functions

Directory of Open Access Journals (Sweden)

Jiushu Xie

2016-09-01

Full Text Available Previous studies have found that bodily stimulation, such as hardness, biases social judgment and evaluation via metaphorical association; however, it remains unclear whether bodily stimulation also affects cognitive functions, such as memory and creativity. The current study used metaphorical associations between hard and rigid and between soft and flexible in Chinese, to investigate whether the experience of hardness affected cognitive functions requiring either rigidity (memory or flexibility (creativity. In Experiment 1, we found that Chinese-speaking participants performed better at recalling previously memorized words while sitting on a hard-surface stool (the hard condition than a cushioned one (the soft condition. In Experiment 2, participants sitting on a cushioned stool outperformed those sitting on a hard-surface stool on a Chinese riddle task, which required creative/flexible thinking, but not on an analogical reasoning task, which required both rigid and flexible thinking. The results suggest the hardness experience affects cognitive functions that are metaphorically associated with rigidity and flexibility. They support the embodiment proposition that cognitive functions and representations could be grounded via metaphorical association in bodily states.

Microstructure and mechanical properties of diamond films on titanium-aluminum-vanadium alloy

Science.gov (United States)

Catledge, Shane Aaron

The primary focus of this dissertation is the investigation of the processing-structure-property relationships of diamond films deposited on Ti-6Al-4V alloy by microwave plasma chemical vapor deposition (MPCVD). By depositing a well-adhered protective layer of diamond on an alloy component, its hardness, wear-resistance, performance, and overall lifetime could be significantly increased. However, due to the large thermal expansion mismatch between the diamond film and metal (and the corresponding residual stress induced in the film), film adhesion is typically unsatisfactory and often results in immediate delamination after processing. Therefore, it is a major goal of this research to improve adhesion of the diamond film to the alloy substrate. Through the use of innovative processing techniques involving MPCVD deposition conditions and methane (CH4), nitrogen (N2), and hydrogen (H2) chemistry, we have achieved diamond films which consistently adhere to the alloy substrate. In addition, we have discovered that, with the appropriate choice of deposition conditions, the film structure can be tailored to range from highly crystalline, well-faceted diamond to nanocrystalline diamond with extremely low surface roughness (as low as 27 nm). The relationship between processing and structure was studied using in-situ optical emission spectroscopy, micro-Raman spectroscopy, surface profilometry, glancing-angle x-ray diffraction, and scanning electron microscopy. We observe that when nitrogen is added to the H2/CH4 feedgas mixture, a carbon-nitrogen (CN) emission band arises and its relative abundance to the carbon dimer (C2) gas species is shown to have a pronounced influence on the diamond film structure. By appropriate choice of deposition chemistry and conditions, we can tailor the diamond film structure and its corresponding properties. The mechanical properties of interest in this thesis are those relating to the integrity of the film/substrate interface, as well as the

Growth and characterization of a-axis oriented Cr-doped AlN films by DC magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Panda, Padmalochan; Ramaseshan, R., E-mail: seshan@igcar.gov.in; Dash, S. [Materials Science Group, IGCAR, Kalpakkam, 603102 (India); Krishna, Nanda Gopala [Corrosion Science and Technology Group, IGCAR, Kalpakkam, 603102 (India)

2016-05-23

Wurtzite type Cr-doped AlN thin films were grown on Si (100) substrates using DC reactive magnetron sputtering with a function of N{sub 2} concentration (15 to 25%). Evolution of crystal structure of these films was studied by GIXRD where a-axis preferred orientation was observed. The electronic binding energy and concentration of Cr in these films were estimated by X-ray photoemission spectroscopy (XPS). We have observed indentation hardness (H{sub IT}) of around 28.2 GPa for a nitrogen concentration of 25%.

TiCx thin films coatings prepared by reactive sputtering

International Nuclear Information System (INIS)

Saoula, N.; Handa, K.; Kesri, R.

2004-01-01

Full text.Transition metal carbides and nitrides attract large technological interest due to their unique properties like high hardness and young modulus, high electric conductivity, a considerable high-temperature strength, high corrosion resistance and high melting or decomposition temperatures. They have been applied as coatings for tools because of their superior properties. these materials have such properties due to atomic bonding, which shows a mixed covalent, metallic and ionic character. Among these nitrides and carbides titanium carbide is a compound of particular importance. Titanium carbide combines the advantages of a high melting point (3140 celsius degree) and hardness (3000 Hv) with those of relative lightness (density 4.93 10 3 Kg m -3 ).It also exhibits high resistance to both corrosion and oxidation and a relatively low friction coefficient. Usually, TiC films are produced by deposition with plasma-enhanced CVD (PCVD), thermal chemical vapour deposition (CVD) or activated reactive evaporation methods. However, these methods require high temperature (>600 celsius degree) substrates to achieve the deposition, which sometimes causes thermal damage to the deposited films. At temperature above 550 celsius degree, thermal diffusion of materials not suitable may also occur. In addition, it has been reported that the maximum temperature which permits the appropriate coating of hardened steel tools is 500 celsius degree. Therefore, it is desirable to develop a deposition technique for TiC films using low-temperature substrates to avoid thermal damage. So, different physical vapour deposition (PVD) processes for deposition of TiC at relatively low temperatures have been used through the years. These processes are based on vaporisation of titanium in hydrocarbon atmosphere or on sputtering of solid TiC target or titanium target in hydrocarbon atmosphere. the most often-used hydrocarbon gases are methane, acetylene, ethene and ethane. In previous works, we

Soybean-oil-based waterborne polyurethane dispersions: effects of polyol functionality and hard segment content on properties.

Science.gov (United States)

Lu, Yongshang; Larock, Richard C

2008-11-01

The environmentally friendly vegetable-oil-based waterborne polyurethane dispersions with very promising properties have been successfully synthesized without difficulty from a series of methoxylated soybean oil polyols (MSOLs) with different hydroxyl functionalities ranging from 2.4 to as high as 4.0. The resulting soybean-oil-based waterborne polyurethane (SPU) dispersions exhibit a uniform particle size, which increases from about 12 to 130 nm diameter with an increase in the OH functionality of the MSOL from 2.4 to 4.0 and decreases with increasing content of the hard segments. The structure and thermophysical and mechanical properties of the resulting SPU films, which contain 50-60 wt % MSOL as renewable resources, have been studied by Fourier transform infrared spectroscopy, differential scanning calorimetry, dynamic mechanical analysis, thermogravimetric analysis, transmission electron microscopy, and mechanical testing. The experimental results reveal that the functionality of the MSOLs and the hard segment content play a key role in controlling the structure and the thermophysical and mechanical properties of the SPU films. These novel films exhibit tensile stress-strain behavior ranging from elastomeric polymers to rigid plastics and possess Young's moduli ranging from 8 to 720 MPa, ultimate tensile strengths ranging from 4.2 to 21.5 MPa, and percent elongation at break values ranging from 16 to 280%. This work has addressed concerns regarding gelation and higher cross-linking caused by the high functionality of vegetable-oil-based polyols. This article reports novel environmentally friendly biobased SPU materials with promising applications as decorative and protective coatings.

Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputtering

International Nuclear Information System (INIS)

Bakoglidis, Konstantinos D.; Schmidt, Susann; Garbrecht, Magnus; Ivanov, Ivan G.; Jensen, Jens; Greczynski, Grzegorz; Hultman, Lars

2015-01-01

increase in film hardness and reduced elastic modulus with increasing V s for all techniques. The harder films were produced by MFMS with hardness as high as 25 GPa. Low friction coefficients, between 0.05 and 0.06, were recorded for all films. Furthermore, CN x films produced by MFMS and DCMS at V s  = 100 and 120 V presented a high wear resistance with wear coefficients of k ≤ 2.3 × 10 −5 mm 3 /Nm. While all CN x films exhibit low friction, wear depends strongly on the structural and mechanical characteristics of the films. The MFMS mode is best suited for the production of hard CN x films, although high compressive stresses challenge the application on steel substrates. Films grown in HiPIMS mode provide adequate adhesion due to low residual stress values, at the expense of lower film hardness. Thus, a relatively wide mechanical property envelope is presented for CN x films, which is relevant for the optimization of CN x film properties intended to be applied as low friction and wear resistant coatings

Deposition and characterization of ZrMoN thin films by reactive magnetron sputtering

International Nuclear Information System (INIS)

Fontes Junir, A.S.; Felix, L.C.; Oliveira, G.B. de; Fernandez, D.R.; Carvalho, R.G.; Tentardini, E.K.; Silva Junior, A.H. da

2016-01-01

Thin films of ZrMoN were deposited by magnetron reactive sputtering technique in order to study the molybdenum influence on the mechanical properties and oxidation resistance of these coatings. Three thin films with molybdenum concentrations from 25 to 40 at.% were selected. The displacement of characteristic peaks of ZrN where identified by GIXRD results of films with larger Mo content. This result is indicative of the Mo accommodation in the lattice structure. Hardness tests revealed favorable results with values up to 33 GPa. Oxidation tests showed that ZrN oxidized at 500 °C with a monoclinic ZrO 2 and tetragonal formation; whereas the thin films with Mo addition impeded the formation of the monoclinic ZrO 2 phase at partial oxidation. (author)

Evolution of structure and mechanical properties of hard yet fracture resistant W-B-C coatings with varying C/W ratio

Czech Academy of Sciences Publication Activity Database

Alishahi, M.; Mirzaei, S.; Souček, P.; Zábranský, L.; Buršíková, V.; Stupavska, M.; Peřina, Vratislav; Balázsi, K.; Czigany, Z.; Vašina, P.

2018-01-01

Roč. 340, č. 4 (2018), s. 103-111 ISSN 0257-8972 R&D Projects: GA MŠk LM2015056 Institutional support: RVO:61389005 Keywords : magnetron sputtering * W-B-C * microstructure * hardness * fracture resistance Subject RIV: JK - Corrosion ; Surface Treatment of Materials OBOR OECD: Coating and films Impact factor: 2.589, year: 2016

Nanocrystalline nickel films with lotus leaf texture for superhydrophobic and low friction surfaces

Science.gov (United States)

Shafiei, Mehdi; Alpas, Ahmet T.

2009-11-01

Nanostructured Ni films with high hardness, high hydrophobicity and low coefficient of friction (COF) were fabricated. The surface texture of lotus leaf was replicated using a cellulose acetate film, on which a nanocrystalline (NC) Ni coating with a grain size of 30 ± 4 nm was electrodeposited to obtain a self-sustaining film with a hardness of 4.42 GPa. The surface texture of the NC Ni obtained in this way featured a high density (4 × 10 3 mm -2) of conical protuberances with an average height of 10.0 ± 2.0 μm and a tip radius of 2.5 ± 0.5 μm. This structure increased the water repellency and reduced the COF, compared to smooth NC Ni surfaces. The application of a short-duration (120 s) electrodeposition process that deposited "Ni crowns" with a larger radius of 6.0 ± 0.5 μm on the protuberances, followed by a perfluoropolyether (PFPE) solution treatment succeeded in producing a surface texture consisting of nanotextured protuberances that resulted in a very high water contact angle of 156°, comparable to that of the superhydrophobic lotus leaf. Additionally, the microscale protuberances eliminated the initial high COF peaks observed when smooth NC Ni films were tested, and the PFPE treatment resulted in a 60% reduction in the steady-state COFs.

Magnetic hysteresis measurements of thin films under isotropic stress.

Science.gov (United States)

Holland, Patrick; Dubey, Archana; Geerts, Wilhelmus

2000-10-01

Nowadays, ferromagnetic thin films are widely applied in devices for information technology (credit cards, video recorder tapes, floppies, hard disks) and sensors (air bags, anti-breaking systems, navigation systems). Thus, with the increase in the use of magnetic media continued investigation of magnetic properties of materials is necessary to help in determining the useful properties of materials for new or improved applications. We are currently interested in studying the effect of applied external stress on Kerr hysteresis curves of thin magnetic films. The Ni and NiFe films were grown using DC magnetron sputtering with Ar as the sputter gas (pAr=4 mTorr; Tsub=55-190 C). Seed and cap layers of Ti were used on all films for adhesion and oxidation protection, respectively. A brass membrane pressure cell was designed to apply in-plane isotropic stress to thin films. In this pressure cell, gas pressure is used to deform a flexible substrate onto which a thin magnetic film has been sputtered. The curvature of the samples could be controlled by changing the gas pressure to the cell. Magneto-Optical in-plane hysteresis curves at different values of strain were measured. The results obtained show that the stress sensitivity is dependent on the film thickness. For the 500nm NiFe films, the coercivity strongly decreased as a function of the applied stress.

Thin films preparation of the Ti-Al-O system by rf-sputtering

International Nuclear Information System (INIS)

Montes de Oca, J. A.; Ceballos A, J.; Galaviz P, J.; Manaud, J. P.; Lahaye, M.; Munoz S, J.

2010-01-01

In the present work Ti-Al-O thin films were synthesized by rf-sputtering technique on glass and silicon (Si) substrates using Ti Al and Ti 3 Al targets in a sputtering chamber with an Ar-O 2 atmosphere. Ti-Al-O thin films were obtained varying experimental parameters such as oxygen percent fed to the reaction chamber, plasma power density and substrate temperature. The films deposited on glass substrates were used to evaluate their optical properties, while those deposited on Si substrates were used to evaluate mechanical and morphological properties. The crystalline structure, morphology, chemical composition and optical properties of the films were evaluated by X-ray diffraction, high-resolution scanning electron microscopy, Auger electron microscopy and visible UV spectroscopy. Films thicknesses were measured using a profiler. The roughness and mechanical properties such as hardness and Young modulus were analyzed by atomic force microscopy and nano indentation technique, respectively. (Author)

Fabrication and Characterization of FeNiCr Matrix-TiC Composite for Polishing CVD Diamond Film

Institute of Scientific and Technical Information of China (English)

Zhuji Jin; Zewei Yuan; Renke Kang; Boxian Dong

2009-01-01

Dynamic friction polishing (DFP) is one of the most promising methods appropriate for polishing CVD diamond film with high efficiency and low cost.By this method CVD diamond film is polished through being simply pressed against a metal disc rotating at a high speed utilizing the thermochemical reaction occurring as a result of dynamic friction between them in the atmosphere.However, the relatively soft materials such as stainless steel, cast iron and nickel alloy widely used for polishing CVD diamond film are easy to wear and adhere to diamond film surface, which may further lead to low efficiency and poor polishing quality.In this paper, FeNiCr matrix-TiC composite used as grinding wheel for polishing CVD diamond film was obtained by combination of mechanical alloying (MA) and spark plasma sintering (SPS).The process of ball milling,composition, density, hardness, high-temperature oxidation resistance and wear resistance of the sintered piece were analyzed.The results show that TiC was introduced in MA-SPS process and had good combination with FeNiCr matrix and even distribution in the matrix.The density of composite can be improved by mechanical alloying.The FeNiCr matrix-TiC composite obtained at 1273 K was found to be superior to at 1173 K sintering in hardness, high-temperature oxidation resistance and wearability.These properties are more favorable than SUS304 for the preparation of high-performance grinding wheel for polishing CVD diamond film.

A study of the chemical, mechanical, and surface properties of thin films of hydrogenated amorphous carbon

Energy Technology Data Exchange (ETDEWEB)

Vandentop, G.J.

1990-07-01

Amorphous hydrogenated carbon (a-C:H) films were studied with the objective of elucidating the nucleation and growth mechanisms, and the origin of their unique physical properties. The films were deposited onto Si(100) substrates both on the powered (negatively self-biased) and on the grounded electrodes from methane in an rf plasma (13.56 MHz) at 65 mTorr and 300 to 370 K. The films produced at the powered electrode exhibited superior mechanical properties, such as high hardness. A mass spectrometer was used to identify neutral species and positive ions incident on the electrodes from the plasma, and also to measure ion energies. The effect of varying ion energy flux on the properties of a-C:H films was investigated using a novel pulsed biasing technique. It was demonstrated that ions were not the dominant deposition species as the total ion flux measured was insufficient to account for the observed deposition rate. The interface between thin films of a-C:H and silicon substrates was investigated using angle resolved x-ray photoelectron spectroscopy. A silicon carbide layer was detected at the interface of a hard a-C:H film formed at the powered electrode. At the grounded electrode, where the kinetic energy is low, no interfacial carbide layer was observed. Scanning tunneling microscopy and high energy electron energy loss spectroscopy was used to investigate the initial stages of growth of a-C:H films. On graphite substrates, films formed at the powered electrode were observed to nucleate in clusters approximately 50 {Angstrom} in diameter, while at the grounded electrode no cluster formation was observed. 58 figs.

A mixed analog-digital radiation hard technology for high energy physics electronics DMILL (Durci Mixte sur Isolant Logico-Linéaire)

CERN Document Server

Beuville, E; Borgeaud, P; Fourches, N T; Rouger, M; Blanc, J P; Bruel, M; Delevoye-Orsier, E; Gautier, J; Du Port de Pontcharra, J; Truche, R; Dupont-Nivet, E; Flament, O; Leray, J L; Martin, J L; Montaron, J; Borel, G; Brice, J M; Chatagnon, P; Terrier, C; Aubert, Jean-Jacques; Delpierre, P A; Habrard, M C; Potheau, R; CERN. Geneva. Detector Research and Development Committee

1992-01-01

The high radiation level expected in the inner regions of the high luminosity LHC detectors (gamma and neutron) will require radiation hardened electronics. A consortium between the CEA (Commissariat a l'Energie Atomique) and Thomson TMS (Thomson Composants Militaires et Spatiaux) has been created to push for the development and the industrialization of a nascent technology which looks particularly adapted to the needs of HEP electronics. This technology, currently under development at the LETI(CEA), uses a SIMOX substrate with an epitaxial silicon film. It includes CMOS, JFETs and vertical bipolar transistors with a potential multi-megarad hardness. The CMOS and bipolar transistors constitute a rad-hard BiCMOS which will be useful to design analog and digital high-speed architectures. JFETs, which have intrinsically high hardness behaviour and low noise performances even at low temperature will enable very rad-hard, low noise front end electronics to be designed. Present results, together with the improvemen...

Hard coal; Steinkohle

Energy Technology Data Exchange (ETDEWEB)

Loo, Kai van de; Sitte, Andreas-Peter [Gesamtverband Steinkohle e.V., Herne (Germany)

2013-04-01

The year 2012 benefited from a growth of the consumption of hard coal at the national level as well as at the international level. Worldwide, the hard coal still is the number one energy source for power generation. This leads to an increasing demand for power plant coal. In this year, the conversion of hard coal into electricity also increases in this year. In contrast to this, the demand for coking coal as well as for coke of the steel industry is still declining depending on the market conditions. The enhanced utilization of coal for the domestic power generation is due to the reduction of the nuclear power from a relatively bad year for wind power as well as reduced import prices and low CO{sub 2} prices. Both justify a significant price advantage for coal in comparison to the utilisation of natural gas in power plants. This was mainly due to the price erosion of the inexpensive US coal which partly was replaced by the expansion of shale gas on the domestic market. As a result of this, the inexpensive US coal looked for an outlet for sales in Europe. The domestic hard coal has continued the process of adaptation and phase-out as scheduled. Two further hard coal mines were decommissioned in the year 2012. RAG Aktiengesellschaft (Herne, Federal Republic of Germany) running the hard coal mining in this country begins with the preparations for the activities after the time of mining.

Structural and magnetic properties of NdFeB and NdFeB/Fe films with Mo addition

Energy Technology Data Exchange (ETDEWEB)

Urse, M; Grigoras, M; Lupu, N; Chiriac, H, E-mail: urse@phys-iasi.ro [National Institute of R and D for Technical Physics, 47 Mangeron Blvd., 700050 Iasi (Romania)

2011-07-06

The influence of the Mo addition on the microstructure and magnetic properties of Nd-Fe-B and Nd-Fe-B/Fe films was studied. The coercivity is a key parameter in the control of technical performances of Nd-Fe-B films. A small amount of about 1 at.% Mo can enhance the coercivity of Nd-Fe-B film by controlling the growth of soft and hard magnetic grains. A coercivity of 22.1 kOe, a remanence ratio, M{sub r}/M{sub s}, of 0.83 and a maximum energy product of 8 MGOe were obtained for Ta/[NdFeBMo(1at.%)(540nm)/Ta films annealed at 650{sup 0}C for 20 minutes due to Mo precipitates formed at the Nd{sub 2}Fe{sub 14}B phase boundaries which prevent the nucleation and expansion of the magnetic domains. Simultaneous use of Mo as addition and the stratification of Nd-Fe-B-Mo films using Fe as spacer layer are important tools for the improvement of the hard magnetic properties of Nd-Fe-B films. The Ta/[NdFeBMo(1at.%)(180nm)/Fe(1nm)]x3/Ta multilayer film annealed at 620{sup 0}C exhibits an increase in the coercivity from 12.1 kOe to 22.8 kOe, in the remanence ratio from 0.77 to 0.80, and in the maximum energy product from 4.5 to 7.1 MGOe in comparison with Ta/Nd-Fe-B/Ta film. As compared to Ta/Nd-Fe-B/Ta film, the Ta/[NdFeBMo(1at.%)(180nm)/Fe(1nm)]x3/Ta film presents a decrease in the crystallization temperature of about 30{sup 0}C.

30 CFR 75.1720-1 - Distinctively colored hard hats, or hard caps; identification for newly employed, inexperienced...

Science.gov (United States)

2010-07-01

... 30 Mineral Resources 1 2010-07-01 2010-07-01 false Distinctively colored hard hats, or hard caps... STANDARDS-UNDERGROUND COAL MINES Miscellaneous § 75.1720-1 Distinctively colored hard hats, or hard caps; identification for newly employed, inexperienced miners. Hard hats or hard caps distinctively different in color...

30 CFR 77.1710-1 - Distinctively colored hard hats or hard caps; identification for newly employed, inexperienced...

Science.gov (United States)

2010-07-01

... 30 Mineral Resources 1 2010-07-01 2010-07-01 false Distinctively colored hard hats or hard caps... Distinctively colored hard hats or hard caps; identification for newly employed, inexperienced miners. Hard hats or hard caps distinctively different in color from those worn by experienced miners shall be worn at...

Mechanical properties of silicon oxynitride thin films prepared by low energy ion beam assisted deposition

International Nuclear Information System (INIS)

Shima, Yukari; Hasuyama, Hiroki; Kondoh, Toshiharu; Imaoka, Yasuo; Watari, Takanori; Baba, Koumei; Hatada, Ruriko

1999-01-01

Silicon oxynitride (SiO x N y ) films (0.1-0.7 μm) were produced on Si (1 0 0), glass and 316L stainless steel substrates by ion beam assisted deposition (IBAD) using Si evaporation and the concurrent bombardment with a mixture of 200 eV N 2 and Ar, or O 2 and Ar ions. Adhesion was evaluated by pull-off tests. Film hardness was measured by a nanoindentation system with AFM. The measurement of internal stress in the films was carried out by the Stoney method. The film structure was examined by GXRD. XPS was employed to measure the composition of films and to analyze the chemical bonds. The dependence of mechanical properties on the film thickness and the processing temperature during deposition was studied. Finally, the relations between the mechanical properties of the films and the correlation with corrosion-protection ability of films are discussed and summarized

Characteristics of Iron-Palladium alloy thin films deposited by magnetron sputtering

Science.gov (United States)

Chiu, Y.-J.; Shen, C.-Y.; Chang, H.-W.; Jian, S.-R.

2018-06-01

The microstructural features, magnetic, nanomechanical properties and wettability behaviors of Iron-Palladium (FePd) alloy thin films are investigated by using X-ray diffraction (XRD), atomic force microscopy (AFM), vibrating sample magnetometer (VSM), nanoindentation and water contact angle (CA) techniques, respectively. The FePd alloy thin films were deposited on glass substrates using a magnetron sputtering system. The post-annealing processes of FePd alloy thin films were carried out at 400 °C and 750 °C and resulted in a significant increase of both the average grain size and surface roughness. The XRD analysis showed that FePd alloy thin films exhibited a predominant (1 1 1) orientation. The magnetic field dependence of magnetization of all FePd thin films are measured at room temperature showed the ferromagnetic characteristics. The nanoindentation with continuous stiffness measurement (CSM) is used to measure the hardness and Young's modulus of present films. The contact angle (θCA) increased with increasing surface roughness. The maximum θCA of 75° was achieved for the FePd alloy thin film after annealing at 750 °C and a surface roughness of 4.2 nm.

Soft magnetic properties of hybrid ferromagnetic films with CoFe, NiFe, and NiFeCuMo layers

Energy Technology Data Exchange (ETDEWEB)

Choi, Jong-Gu [Eastern-western Biomedical Engineering, Sangji University, Wonju 220-702 (Korea, Republic of); Hwang, Do-Guwn [Dept. of Oriental Biomedical Engineering, Sangji University, Wonju 220-702 (Korea, Republic of); Rhee, Jang-Roh [Dept. of Physics, Sookmyung Women' s University, Seoul 140-742 (Korea, Republic of); Lee, Sang-Suk, E-mail: sslee@sangji.ac.kr [Dept. of Oriental Biomedical Engineering, Sangji University, Wonju 220-702 (Korea, Republic of)

2011-09-30

Two-layered ferromagnetic alloy films (NiFe and CoFe) with intermediate NiFeCuMo soft magnetic layers of different thicknesses were investigated to understand the relationship between coercivity and magnetization process by taking into account the strength of hard-axis saturation field. The thickness dependence of H{sub EC} (easy-axis coercivity), H{sub HS} (hard-axis saturation field), and {chi} (susceptibility) of the NiFeCuMo thin films in glass/Ta(5 nm)/[CoFe or NiFe(5 nm-t/2)]/NiFeCuMo(t = 0, 4, 6, 8, 10 nm)/[CoFe or NiFe(5 nm-t/2)]/Ta(5 nm) films prepared using the ion beam deposition method was determined. The magnetic properties (H{sub EC}, H{sub HS}, and {chi}) of the ferromagnetic CoFe, NiFe three-layers with an intermediate NiFeCuMo super-soft magnetic layer were strongly dependent on the thickness of the NiFeCuMo layer.

Tribological performance of ultrathin diamond-like carbon films prepared by plasma-based ion implantation

International Nuclear Information System (INIS)

Liao, J X; Li, E Q; Tian, Z; Pan, X F; Xu, J; Jin, L; Yang, H G

2008-01-01

Ultrathin diamond-like carbon (DLC) films with thicknesses of 5-60 nm have been prepared on Si by plasma-based ion implantation. Raman spectrum and x-ray photoelectron spectroscopy (XPS) show that these DLC films present high sp 3 /sp 2 ratios. XPS also displays that each DLC film firmly adheres to the Si substrate owing to a C-Si transition layer. Atomic force microscopy shows that the DLC films are smooth and compact with average roughness (R a ) of about 0.25 nm. Sliding friction experiments reveal that these DLC films show significantly improved tribological performance. With increase of DLC film thickness, the sp 3 /sp 2 ratio increases, the roughness decreases, the hardness increases, the adhesive wear lightens and thereby the tribological performance becomes enhanced. Also, the effects of the applied load and the reciprocating frequency on the tribological performance are discussed

A Demonstrator Analog Signal Processing Circuit in a Radiation Hard SOI-CMOS Technology

CERN Multimedia

2002-01-01

% RD-9 A Demonstrator Analog Signal Processing Circuit in a Radiation Hard SOI-CMOS Technology \\\\ \\\\Radiation hardened SOI-CMOS (Silicon-On-Insulator, Complementary Metal-Oxide- \\linebreak Semiconductor planar microelectronic circuit technology) was a likely candidate technology for mixed analog-digital signal processing electronics in experiments at the future high luminosity hadron colliders. We have studied the analog characteristics of circuit designs realized in the Thomson TCS radiation hard technologies HSOI3-HD. The feature size of this technology was 1.2 $\\mu$m. We have irradiated several devices up to 25~Mrad and 3.10$^{14}$ neutrons cm$^{-2}$. Gain, noise characteristics and speed have been measured. Irradiation introduces a degradation which in the interesting bandwidth of 0.01~MHz~-~1~MHz is less than 40\\%. \\\\ \\\\Some specific SOI phenomena have been studied in detail, like the influence on the noise spectrum of series resistence in the thin silicon film that constitutes the body of the transistor...

Superlubricity and wearless sliding in diamondlike carbon films

International Nuclear Information System (INIS)

Erdemir, A.

2001-01-01

Diamondlike carbon (DLC) films have attracted great interest in recent years mainly because of their unusual optical, electrical, mechanical, and tribological properties. Such properties are currently being exploited for a wide range of engineering applications including magnetic hard disks, gears, sliding and roller bearings, scratch resistant glasses, biomedical implants, etc. Systematic studies on carbon-based materials in our laboratory have led to the development of a new class of amorphous DLC films that provide extremely low friction and wear coefficients of 0.001 to 0.005 and 10(sup -11) to 10(sup -10) mm(sup 3) /N.m, respectively, when tested in inert-gas or high-vacuum environments. These films were produced in highly hydrogenated gas discharge plasmas by a plasma enhanced chemical vapor deposition process at room temperature. The carbon source gases used in the deposition of these films included methane, acetylene, and ethylene. Tribological studies in our laboratory have established a very close correlation between the composition of the plasmas and the friction and wear coefficients of the resultant DLC films. Specifically, the friction and wear coefficients of DLC films grown in plasmas with higher hydrogen-to-carbon ratios were much lower than films derived from source gases with lower hydrogen-to-carbon ratios. Fundamental tribological and surface analytical studies have led us to conclude that hydrogen (within the film, as well as on the sliding surfaces) is extremely important for the superlubricity and wearless sliding behavior of these films. Based on these studies, a mechanistic model is proposed to explain the superlow friction and wear properties of the new DLC films

Magnetization reversal and exchange bias effects in hard/soft ferromagnetic bilayers with orthogonal anisotropies

International Nuclear Information System (INIS)

Navas, D; Ross, C A; Torrejon, J; Béron, F; Pirota, K R; Redondo, C; Sierra, B; Castaño, F; Batallan, F; Toperverg, B P; Devishvili, A

2012-01-01

The magnetization reversal processes are discussed for exchange-coupled ferromagnetic hard/soft bilayers made from Co 0.66 Cr 0.22 Pt 0.12 (10 and 20 nm)/Ni (from 0 to 40 nm) films with out-of-plane and in-plane magnetic easy axes respectively, based on room temperature hysteresis loops and first-order reversal curve analysis. On increasing the Ni layer thicknesses, the easy axis of the bilayer reorients from out-of-plane to in-plane. An exchange bias effect, consisting of a shift of the in-plane minor hysteresis loops along the field axis, was observed at room temperature after in-plane saturation. This effect was associated with specific ferromagnetic domain configurations experimentally determined by polarized neutron reflectivity. On the other hand, perpendicular exchange bias effect was revealed from the out-of-plane hysteresis loops and it was attributed to residual domains in the magnetically hard layer. (paper)

Nanomechanical investigation of thin-film electroceramic/metal-organic framework multilayers

Energy Technology Data Exchange (ETDEWEB)

Best, James P., E-mail: james.best@empa.ch, E-mail: engelbert.redel@kit.edu, E-mail: christof.woell@kit.edu; Michler, Johann; Maeder, Xavier [Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, CH-3602 Thun (Switzerland); Liu, Jianxi; Wang, Zhengbang; Tsotsalas, Manuel; Liu, Jinxuan; Gliemann, Hartmut; Weidler, Peter G.; Redel, Engelbert, E-mail: james.best@empa.ch, E-mail: engelbert.redel@kit.edu, E-mail: christof.woell@kit.edu; Wöll, Christof, E-mail: james.best@empa.ch, E-mail: engelbert.redel@kit.edu, E-mail: christof.woell@kit.edu [Institute of Functional Interfaces (IFG), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Röse, Silvana [Preparative Macromolecular Chemistry, Institute for Chemical Technology and Polymer Chemistry (ICTP), Karlsruhe Institute of Technology (KIT), Engesserstrasse 18, 76128 Karlsruhe (Germany); Institute for Biological Interfaces (IBG), Karlsruhe Institute of Technology (KIT), Herrmann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Oberst, Vanessa [Institute of Applied Materials (IAM), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany); Walheim, Stefan [Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen (Germany)

2015-09-07

Thin-film multilayer stacks of mechanically hard magnetron sputtered indium tin oxide (ITO) and mechanically soft highly porous surface anchored metal-organic framework (SURMOF) HKUST-1 were studied using nanoindentation. Crystalline, continuous, and monolithic surface anchored MOF thin films were fabricated using a liquid-phase epitaxial growth method. Control over respective fabrication processes allowed for tuning of the thickness of the thin film systems with a high degree of precision. It was found that the mechanical indentation of such thin films is significantly affected by the substrate properties; however, elastic parameters were able to be decoupled for constituent thin-film materials (E{sub ITO} ≈ 96.7 GPa, E{sub HKUST−1} ≈ 22.0 GPa). For indentation of multilayer stacks, it was found that as the layer thicknesses were increased, while holding the relative thickness of ITO and HKUST-1 constant, the resistance to deformation was significantly altered. Such an observation is likely due to small, albeit significant, changes in film texture, interfacial roughness, size effects, and controlling deformation mechanism as a result of increasing material deposition during processing. Such effects may have consequences regarding the rational mechanical design and utilization of MOF-based hybrid thin-film devices.

Nanomechanical investigation of thin-film electroceramic/metal-organic framework multilayers

International Nuclear Information System (INIS)

Best, James P.; Michler, Johann; Maeder, Xavier; Liu, Jianxi; Wang, Zhengbang; Tsotsalas, Manuel; Liu, Jinxuan; Gliemann, Hartmut; Weidler, Peter G.; Redel, Engelbert; Wöll, Christof; Röse, Silvana; Oberst, Vanessa; Walheim, Stefan

2015-01-01

Thin-film multilayer stacks of mechanically hard magnetron sputtered indium tin oxide (ITO) and mechanically soft highly porous surface anchored metal-organic framework (SURMOF) HKUST-1 were studied using nanoindentation. Crystalline, continuous, and monolithic surface anchored MOF thin films were fabricated using a liquid-phase epitaxial growth method. Control over respective fabrication processes allowed for tuning of the thickness of the thin film systems with a high degree of precision. It was found that the mechanical indentation of such thin films is significantly affected by the substrate properties; however, elastic parameters were able to be decoupled for constituent thin-film materials (E ITO  ≈ 96.7 GPa, E HKUST−1  ≈ 22.0 GPa). For indentation of multilayer stacks, it was found that as the layer thicknesses were increased, while holding the relative thickness of ITO and HKUST-1 constant, the resistance to deformation was significantly altered. Such an observation is likely due to small, albeit significant, changes in film texture, interfacial roughness, size effects, and controlling deformation mechanism as a result of increasing material deposition during processing. Such effects may have consequences regarding the rational mechanical design and utilization of MOF-based hybrid thin-film devices

Effect of a hard coat layer on buckle delamination of thin ITO layers on a compliant elasto-plastic substrate: an experimental–numerical approach

NARCIS (Netherlands)

Sluis, van der O.; Abdallah, Amir; Bouten, P.C.P.; Timmermans, P.H.M.; Toonder, den J.M.J.; With, de G.

2011-01-01

Layer buckling and delamination is a common interfacial failure phenomenon in thin film multi-layer structures that are used in flexible display applications. Typically, the substrate is coated on both sides with a hybrid coating, calleda hard coat (HC), which acts as a gas barrier and also

Effects of atomic oxygen on titanium dioxide thin film

Science.gov (United States)

Shimosako, Naoki; Hara, Yukihiro; Shimazaki, Kazunori; Miyazaki, Eiji; Sakama, Hiroshi

2018-05-01

In low earth orbit (LEO), atomic oxygen (AO) has shown to cause degradation of organic materials used in spacecrafts. Similar to other metal oxides such as SiO2, Al2O3 and ITO, TiO2 has potential to protect organic materials. In this study, the anatese-type TiO2 thin films were fabricated by a sol-gel method and irradiated with AO. The properties of TiO2 were compared using mass change, scanning electron microscope (SEM), atomic force microscope (AFM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), transmittance spectra and photocatalytic activity before and after AO irradiation. The results indicate that TiO2 film was hardly eroded and resistant against AO degradation. AO was shown to affects only the surface of a TiO2 film and not the bulk. Upon AO irradiation, the TiO2 films were slightly oxidized. However, these changes were very small. Photocatalytic activity of TiO2 was still maintained in spite of slight decrease upon AO irradiation, which demonstrated that TiO2 thin films are promising for elimination of contaminations outgassed from a spacecraft's materials.

Composition, structure and properties of SiN x films fabricated by pulsed reactive closed-field unbalanced magnetron sputtering

International Nuclear Information System (INIS)

Yao, Zh.Q.; Yang, P.; Huang, N.; Sun, H.; Wan, G.J.; Leng, Y.X.; Chen, J.Y.

2005-01-01

Silicon nitride (SiN x ) thin films are of special interest in both scientific research and industrial applications due to their remarkable properties such as high thermal stability, chemical inertness, high hardness and good dielectric properties. In this work, SiN x films were fabricated by pulsed reactive closed-field unbalanced magnetron sputtering of high purity single crystal silicon targets in an Ar-N 2 mixture. The effect of N 2 partial pressure on the film composition, chemical bonding configurations, surface morphology, surface free energy, optical and mechanical properties were investigated. We showed that with increased N 2 partial pressure, the N to Si ratio (N/Si) in the film increased and N atoms are preferentially incorporated in the NSi 3 stoichiometric configuration. It leads the Si-N network a tendency to chemical order. Films deposited at a high N 2 fraction were consistently N-rich. The film surface transformed from a loose granular structure with microporosity to a homogeneous, continuous, smooth and dense structure. A progressive densification of the film microstructure occurs as the N 2 fraction is increased. The reduced surface roughness and the increased N incorporation in the film give rise to the increased contact angle with double-distilled water from 24 o to 49.6 o . To some extent, the SiN x films deposited by pulsed magnetron sputtering are hydrophilic in nature. The as-deposited SiN x films exhibit good optical transparency in the visible region and the optical band gap E opt can be varied from 1.68 eV for a-Si to 3.62 eV for SiN x films, depending on the synthesis parameters. With the increase of the N/Si atomic ratio, wear resistance of the SiN x films was improved, a consequence of increased hardness and elastic modulus. The SiN x films have lower friction coefficient and better wear resistance than 316L stainless steel under dry sliding friction, where the SiN x films experienced only fatigue wear

Censoring and Selling Film Noir

Directory of Open Access Journals (Sweden)

Sheri Chinen Biesen

2015-05-01

Full Text Available Film noir is known for its duplicity. Industry censors considered 1940s noir cinema provocative, salacious and ‘sordid.’ Hollywood studios walked a fine line between appearing to comply with Hays office Production Code censorship while simultaneously pushing the envelope of its moral constraints, then hyping and sensationalizing censorable sex, violence and hard-hitting themes to sell noir films to the public. In fact, studios capitalized on the racy explicit nature of noir pictures in publicity contradicting assurances of censorial compliance. For instance, censor Joseph Breen was “shocked” when MGM purchased James Cain’s The Postman Always Rings Twice. It was banned for a decade. Yet, ten years later as filmmakers adapted hardboiled fiction, Breen assured religious groups it would “not be offensive.” Yet, it was promoted as “torrid,” “too hot to handle” with Lana Turner in a bathing suit finding “Love at Laguna Beach” with hunky John Garfield who clamored, “You must be a she-devil,” suggesting far more sex, skin and “savage boldness” than is shown in the film. Film noir responded to Production Code censorship and other regulatory factors, including Office of War Information Bureau of Motion Pictures restrictions on Hollywood screen depictions of the domestic American home front (or overseas combat front, and Office of Censorship strictures such as a wartime ban on screen gangsters as ‘un-American’ for propaganda purposes in World War II-era noir films centering on criminals. These multiple censorship entities often collided. This regulatory climate catalyzed the development of film noir, a dark cycle of shadowy 1940s-50s crime films that boomed by World War II and evolved over the postwar era. I will investigate extensive primary archival research—including scripts, memos from industry censors, writers, directors, producers, and publicity records—to compare how film noir was censored and sold.

Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Bakoglidis, Konstantinos D., E-mail: konba@ifm.liu.se; Schmidt, Susann; Garbrecht, Magnus; Ivanov, Ivan G.; Jensen, Jens; Greczynski, Grzegorz; Hultman, Lars [Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden)

2015-09-15

��GPa. Nanoindentation showed a significant increase in film hardness and reduced elastic modulus with increasing V{sub s} for all techniques. The harder films were produced by MFMS with hardness as high as 25 GPa. Low friction coefficients, between 0.05 and 0.06, were recorded for all films. Furthermore, CN{sub x} films produced by MFMS and DCMS at V{sub s} = 100 and 120 V presented a high wear resistance with wear coefficients of k ≤ 2.3 × 10{sup −5} mm{sup 3}/Nm. While all CN{sub x} films exhibit low friction, wear depends strongly on the structural and mechanical characteristics of the films. The MFMS mode is best suited for the production of hard CN{sub x} films, although high compressive stresses challenge the application on steel substrates. Films grown in HiPIMS mode provide adequate adhesion due to low residual stress values, at the expense of lower film hardness. Thus, a relatively wide mechanical property envelope is presented for CN{sub x} films, which is relevant for the optimization of CN{sub x} film properties intended to be applied as low friction and wear resistant coatings.

Photon technology. Hard photon technology; Photon technology. Hard photon gijutsu

Energy Technology Data Exchange (ETDEWEB)

NONE

1997-03-01

For the application of photon to industrial technologies, in particular, a hard photon technology was surveyed which uses photon beams of 0.1-200nm in wavelength. Its features such as selective atom reaction, dense inner shell excitation and spacial high resolution by quantum energy are expected to provide innovative techniques for various field such as fine machining, material synthesis and advanced inspection technology. This wavelength region has been hardly utilized for industrial fields because of poor development of suitable photon sources and optical devices. The developmental meaning, usable time and issue of a hard photon reduction lithography were surveyed as lithography in ultra-fine region below 0.1{mu}m. On hard photon analysis/evaluation technology, the industrial use of analysis, measurement and evaluation technologies by micro-beam was viewed, and optimum photon sources and optical systems were surveyed. Prediction of surface and surface layer modification by inner shell excitation, the future trend of this process and development of a vacuum ultraviolet light source were also surveyed. 383 refs., 153 figs., 17 tabs.

Mechanical properties of metal-organic frameworks: An indentation study on epitaxial thin films

Science.gov (United States)

Bundschuh, S.; Kraft, O.; Arslan, H. K.; Gliemann, H.; Weidler, P. G.; Wöll, C.

2012-09-01

We have determined the hardness and Young's modulus of a highly porous metal-organic framework (MOF) using a standard nanoindentation technique. Despite the very low density of these films, 1.22 g cm-3, Young's modulus reaches values of almost 10 GPa for HKUST-1, demonstrating that this porous coordination polymer is substantially stiffer than normal polymers. This progress in characterizing mechanical properties of MOFs has been made possible by the use of high quality, oriented thin films grown using liquid phase epitaxy on modified Au substrates.

Artificially controlled stress anisotropy and magnetic properties of FeTaN thin films

International Nuclear Information System (INIS)

Deng, H.; Jarratt, J.D.; Minor, M.K.; Barnard, J.A.

1997-01-01

This article presents a new method of investigating internal stress effects on thin film magnetic properties, in this case magnetically soft FeTaN sputtered films. The FeTaN films were deposited on a series of oxidized silicon (111) substrates prestressed to different degrees. During sputtering all the deposition conditions were kept exactly the same for all the samples. However, anisotropic stresses with different amplitudes are systematically introduced into the films when the prestressed wafers were released. In this way, FeTaN films with compressive stress varying from 80 to 608 MPa are produced. We found that the saturation magnetostriction (λ s ), anisotropy field (H k ), initial permeability (μ i ) as well as easy axis orientation of FeTaN thin films are strongly affected by the induced stress anisotropy. A stress ratio concept is proposed as a measure of the degree of the stress anisotropy. Models for easy-hard axis switching induced by stress for magnetic films with positive magnetostriction are discussed. copyright 1997 American Institute of Physics

Hard X-ray quantum optics in thin films nanostructures

Energy Technology Data Exchange (ETDEWEB)

Haber, Johann Friedrich Albert

2017-05-15

This thesis describes quantum optical experiments with X-rays with the aim of reaching the strong-coupling regime of light and matter. We make use of the interaction which arises between resonant matter and X-rays in specially designed thin-film nanostructures which form X-ray cavities. Here, the resonant matter are Tantalum atoms and the Iron isotope {sup 57}Fe. Both limit the number of modes available to the resonant atoms for interaction, and enhances the interaction strength. Thus we have managed to observe a number of phenomena well-known in quantum optics, which are the building blocks for sophisticated applications in e.g. metrology. Among these are the strong coupling of light and matter and the concurrent exchange of virtual photons, often called Rabi oscillations. Furthermore we have designed and tested a type of cavity hitherto unused in X-ray optics. Finally, we develop a new method for synchrotron Moessbauer spectroscopy, which not only promises to yield high-resolution spectra, but also enables the retrieval of the phase of the scattered light. The results open new avenues for quantum optical experiments with X-rays, particularly with regards to the ongoing development of high-brilliance X-ray free-electron lasers.

Hard X-ray quantum optics in thin films nanostructures

International Nuclear Information System (INIS)

Haber, Johann Friedrich Albert

2017-05-01

This thesis describes quantum optical experiments with X-rays with the aim of reaching the strong-coupling regime of light and matter. We make use of the interaction which arises between resonant matter and X-rays in specially designed thin-film nanostructures which form X-ray cavities. Here, the resonant matter are Tantalum atoms and the Iron isotope "5"7Fe. Both limit the number of modes available to the resonant atoms for interaction, and enhances the interaction strength. Thus we have managed to observe a number of phenomena well-known in quantum optics, which are the building blocks for sophisticated applications in e.g. metrology. Among these are the strong coupling of light and matter and the concurrent exchange of virtual photons, often called Rabi oscillations. Furthermore we have designed and tested a type of cavity hitherto unused in X-ray optics. Finally, we develop a new method for synchrotron Moessbauer spectroscopy, which not only promises to yield high-resolution spectra, but also enables the retrieval of the phase of the scattered light. The results open new avenues for quantum optical experiments with X-rays, particularly with regards to the ongoing development of high-brilliance X-ray free-electron lasers.

Characterization of silicon oxynitride films prepared by the simultaneous implantation of oxygen and nitrogen ions into silicon

International Nuclear Information System (INIS)

Hezel, R.; Streb, W.

1985-01-01

Silicon oxynitride films about 5 nm in thickness were prepared by simultaneously implanting 5 keV oxygen and nitrogen ions into silicon at room temperature up to saturation. These films with concentrations ranging from pure silicon oxide to silicon nitride were characterized using Auger electron spectroscopy, electron energy loss spectroscopy and depth-concentration profiling. The different behaviour of the silicon oxynitride films compared with those of silicon oxide and silicon nitride with regard to thermal stability and hardness against electron and argon ion irradiation is pointed out. (Auth.)

Thermodynamic perturbation theory for fused hard-sphere and hard-disk chain fluids

International Nuclear Information System (INIS)

Zhou, Y.; Hall, C.K.; Stell, G.

1995-01-01

We find that first-order thermodynamic perturbation theory (TPT1) which incorporates the reference monomer fluid used in the generalized Flory--AB (GF--AB) theory yields an equation of state for fused hard-sphere (FHS) chain fluids that has accuracy comparable to the GF--AB and GF--dimer--AC theories. The new TPT1 equation of state is significantly more accurate than other extensions of the TPT1 theory to FHS chain fluids. The TPT1 is also extended to two-dimensional fused hard-disk chain fluids. For the fused hard-disk dimer fluid, the extended TPT1 equation of state is found to be more accurate than the Boublik hard-disk dimer equation of state. copyright 1995 American Institute of Physics

Laser plasma generation of hydrogen-free diamond-like carbon thin films on Zr-2.5Nb CANDU pressure tube materials and silicon wafers with a pulsed high-power CO2 laser

International Nuclear Information System (INIS)

Ebrahim, N.A.; Mouris, J.F.; Hoffmann, C.R.J.; Davis, R.W.

1995-06-01

We report the first experiments on the laser plasma deposition of hydrogen-free, diamond-like carbon (DLC) films on Zr-2.5Nb CANDU pressure-tube materials and silicon substrates, using the short-pulse, high-power, CO 2 laser in the High-Power Laser Laboratory at Chalk River Laboratories. The films were (AFM). The thin films show the characteristic signature of DLC films in the Raman spectra obtained using a krypton-ion (Kr + ) laser. The Vickers ultra-low-load microhardness tests show hardness of the coated surface of approximately 7000 Kg force mm -2 , which is consistent with the hardness associated with DLC films. AFM examination of the film morphology shows diamond-like crystals distributed throughout the film, with film thicknesses of up to 0.5 μm generated with 50 laser pulses. With significantly more laser pulses, it is expected that very uniform diamond-like films would be produced. These experiments suggest that it should be possible to deposit hydrogen-free, diamond-like films of relevance to nuclear reactor components with a high-power and high-repetition-rate laser facility. (author). 7 refs., 2 tabs., 15 figs

Direct Fabrication of Inkjet-Printed Dielectric Film for Metal-Insulator-Metal Capacitors

Science.gov (United States)

Cho, Cheng-Lin; Kao, Hsuan-ling; Wu, Yung-Hsien; Chang, Li-Chun; Cheng, Chun-Hu

2018-01-01

In this study, an inkjet-printed dielectric film that used a polymer-based SU-8 ink was fabricated for use in a metal-insulator-metal (MIM) capacitor. Thermal treatment of the inkjet-printed SU-8 polymer film affected its surface morphology, chemical structure, and surface wettability. A 20-min soft-bake at 60°C was applied to eliminate inkjet-printed bubbles and ripples. The ultraviolet-exposed SU-8 polymer film was crosslinked at temperatures between 120°C and 220°C and became disordered at 270°C, demonstrated using Fourier-transform infrared spectroscopy. A maximum SU-8 polymer film hard-bake temperature of 120°C was identified, and a printing process was subsequently employed because the appropriate water contact angle of the printed film was 79°. Under the appropriate inkjet printing conditions, the two-transmission-line method was used to extract the dielectric and electrical properties of the SU-8 polymer film, and the electrical behavior of the fabricated MIM capacitor was also characterized.

The W alloying effect on thermal stability and hardening of nanostructured Cu–W alloyed thin films

Science.gov (United States)

Zhao, J. T.; Zhang, J. Y.; Hou, Z. Q.; Wu, K.; Feng, X. B.; Liu, G.; Sun, J.

2018-05-01

In order to achieve desired mechanical properties of alloys by manipulating grain boundaries (GBs) via solute decoration, it is of great significance to understand the underlying mechanisms of microstructural evolution and plastic deformation. In this work, nanocrystalline (NC) Cu–W alloyed films with W concentrations spanning from 0 to 40 at% were prepared by using magnetron sputtering. Thermal stability (within the temperature range of 200 °C–600 °C) and hardness of the films were investigated by using the x-ray diffraction, transmission electron microscope (TEM) and nanoindentation, respectively. The NC pure Cu film exhibited substantial grain growth upon all annealing temperatures. The Cu–W alloyed films, however, displayed distinct microstructural evolution that depended not only on the W concentration but also on the annealing temperature. At a low temperature of 200 °C, all the Cu–W alloyed films were highly stable, with unconspicuous change in grain sizes. At high temperatures of 400 °C and 600 °C, the microstructural evolution was greatly controlled by the W concentrations. The Cu–W films with low W concentration manifested abnormal grain growth (AGG), while the ones with high W concentrations showed phase separation. TEM observations unveiled that the AGG in the Cu–W alloyed thin films was rationalized by GB migration. Nanoindentation results showed that, although the hardness of both the as-deposited and annealed Cu–W alloyed thin films monotonically increased with W concentrations, a transition from annealing hardening to annealing softening was interestingly observed at the critical W addition of ∼25 at%. It was further revealed that an enhanced GB segregation associated with detwinning was responsible for the annealing hardening, while a reduced solid solution hardening for the annealing softening.

The W alloying effect on thermal stability and hardening of nanostructured Cu-W alloyed thin films.

Science.gov (United States)

Zhao, J T; Zhang, J Y; Hou, Z Q; Wu, K; Feng, X B; Liu, G; Sun, J

2018-05-11

In order to achieve desired mechanical properties of alloys by manipulating grain boundaries (GBs) via solute decoration, it is of great significance to understand the underlying mechanisms of microstructural evolution and plastic deformation. In this work, nanocrystalline (NC) Cu-W alloyed films with W concentrations spanning from 0 to 40 at% were prepared by using magnetron sputtering. Thermal stability (within the temperature range of 200 °C-600 °C) and hardness of the films were investigated by using the x-ray diffraction, transmission electron microscope (TEM) and nanoindentation, respectively. The NC pure Cu film exhibited substantial grain growth upon all annealing temperatures. The Cu-W alloyed films, however, displayed distinct microstructural evolution that depended not only on the W concentration but also on the annealing temperature. At a low temperature of 200 °C, all the Cu-W alloyed films were highly stable, with unconspicuous change in grain sizes. At high temperatures of 400 °C and 600 °C, the microstructural evolution was greatly controlled by the W concentrations. The Cu-W films with low W concentration manifested abnormal grain growth (AGG), while the ones with high W concentrations showed phase separation. TEM observations unveiled that the AGG in the Cu-W alloyed thin films was rationalized by GB migration. Nanoindentation results showed that, although the hardness of both the as-deposited and annealed Cu-W alloyed thin films monotonically increased with W concentrations, a transition from annealing hardening to annealing softening was interestingly observed at the critical W addition of ∼25 at%. It was further revealed that an enhanced GB segregation associated with detwinning was responsible for the annealing hardening, while a reduced solid solution hardening for the annealing softening.

Constitution, microstructure, mechanical properties, and performance of magnetron-sputtered carbon films with additions of silicon

Energy Technology Data Exchange (ETDEWEB)

Bauer, C. [Forschungszentrum Karlsruhe GmbH, Institut fuer Materialforschung I, Postfach 3640, 76021 Karlsruhe (Germany); Leiste, H.; Stueber, M.; Ulrich, S.; Holleck, H.

2003-11-01

Amorphous carbon films with additions of silicon were deposited by non-reactive magnetron sputtering on WC-Co hard metal and on silicon substrates. The targets were hot-pressed, homogenous mixtures of graphite and silicon carbide powder. Additional argon ion bombardment of the growing film was applied by a substrate bias varied between 0V and -800 V. The deposited amorphous carbon films with two different silicon contents (5 at.% and 23 at.% respectively) were characterised with respect to their microstructure, density, thickness, residual stress, Vickers hardness, Young's modulus, critical load of failure, friction coefficient, and wear behaviour. The residual stress of the carbon films could be remarkably lowered by silicon additions (23 at.%). The hardness reached high values (2200 HV0.05) and the friction coefficient for unlubricated sliding friction against a steel (1.3505) counterpart was as low as 0.06. (Abstract Copyright [2003], Wiley Periodicals, Inc.) [German] Amorphe Kohlenstoffschichten mit Zusaetzen von Silizium wurden nichtreaktiv durch Magnetronzerstaeubung auf Substraten aus WC-Co Hartmetall und Silizium abgeschieden. Die neuartigen Targets wurden durch Heisspressen einer homogenen Mischung aus Graphit- und Siliziumcarbidpulver hergestellt. Durch Anlegen einer elektrischen Substratvorspannung von 0 V bis -800 V wurden die aufwachsenden Schichten zusaetzlich mit Argonionen unterschiedlicher Energie beschossen. Die abgeschiedenen amorphen Kohlenstoffschichten mit Zusaetzen von Silizium (5 at% bzw. 23 at%) wurden hinsichtlich Struktur, Dichte, Dicke, Eigenspannungen, Vickershaerte, reduziertem Elastizitaetsmodul, kritischer Last des Versagens im Ritztest, Reibwert und Verschleissverhalten untersucht. Fuer Schichten mit hohem Siliziumgehalt (23 at%) erfolgte eine erhebliche Reduzierung der Eigenspannung, die Haerte wurde bei sehr hohen Werten stabilisiert (2200 HV0,05) und der Reibungskoeffizient fuer ungeschmierte Gleitreibung gegen Stahl (1

Bioinspired lubricating films of cellulose nanofibrils and hyaluronic acid.

Science.gov (United States)

Valle-Delgado, Juan José; Johansson, Leena-Sisko; Österberg, Monika

2016-02-01

The development of materials that combine the excellent mechanical strength of cellulose nanofibrils (CNF) with the lubricating properties of hyaluronic acid (HA) is a new, promising approach to cartilage implants not explored so far. A simple, solvent-free method to produce a very lubricating, strong cellulosic material by covalently attaching HA to the surface of CNF films is described in this work. A detailed analysis of the tribological properties of the CNF films with and without HA is also presented. Surface and friction forces at micro/nanoscale between model hard surfaces (glass microspheres) and the CNF thin films were measured using an atomic force microscope and the colloid probe technique. The effect of HA attachment, the pH and the ionic strength of the aqueous medium on the forces was examined. Excellent lubrication was observed for CNF films with HA attached in conditions where the HA layer was highly hydrated. These results pave the way for the development of new nanocellulose-based materials with good lubrication properties that could be used in biomedical applications. Copyright © 2015 Elsevier B.V. All rights reserved.

Hard-on-hard lubrication in the artificial hip under dynamic loading conditions.

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Robert Sonntag

Full Text Available The tribological performance of an artificial hip joint has a particularly strong influence on its success. The principle causes for failure are adverse short- and long-term reactions to wear debris and high frictional torque in the case of poor lubrication that may cause loosening of the implant. Therefore, using experimental and theoretical approaches models have been developed to evaluate lubrication under standardized conditions. A steady-state numerical model has been extended with dynamic experimental data for hard-on-hard bearings used in total hip replacements to verify the tribological relevance of the ISO 14242-1 gait cycle in comparison to experimental data from the Orthoload database and instrumented gait analysis for three additional loading conditions: normal walking, climbing stairs and descending stairs. Ceramic-on-ceramic bearing partners show superior lubrication potential compared to hard-on-hard bearings that work with at least one articulating metal component. Lubrication regimes during the investigated activities are shown to strongly depend on the kinematics and loading conditions. The outcome from the ISO gait is not fully confirmed by the normal walking data and more challenging conditions show evidence of inferior lubrication. These findings may help to explain the differences between the in vitro predictions using the ISO gait cycle and the clinical outcome of some hard-on-hard bearings, e.g., using metal-on-metal.

Radiation Hard and Self Healing Substrate Agnostic Nanocrystalline ZnO Thin Film Electronics

Science.gov (United States)

2017-04-14

experiment involved both groups exchanging process recipes for their nominal growth structures; specifically the films were annealed at 400 °C in air for...1 hour at AFRL, according to AFRL’s nominal process recipe . The samples as modified from the baseline process are shown in Figure 11. A direct...also a small barrier at the contacts. DISTRIBUTION A. Approved for public release: distribution unlimited. Approximately 500 simulation runs were

Remember Hard But Think Softly: Metaphorical Effects of Hardness/Softness on Cognitive Functions

Science.gov (United States)

Xie, Jiushu; Lu, Zhi; Wang, Ruiming; Cai, Zhenguang G.

2016-01-01

Previous studies have found that bodily stimulation, such as hardness biases social judgment and evaluation via metaphorical association; however, it remains unclear whether bodily stimulation also affects cognitive functions, such as memory and creativity. The current study used metaphorical associations between “hard” and “rigid” and between “soft” and “flexible” in Chinese, to investigate whether the experience of hardness affects cognitive functions whose performance depends prospectively on rigidity (memory) and flexibility (creativity). In Experiment 1, we found that Chinese-speaking participants performed better at recalling previously memorized words while sitting on a hard-surface stool (the hard condition) than a cushioned one (the soft condition). In Experiment 2, participants sitting on a cushioned stool outperformed those sitting on a hard-surface stool on a Chinese riddle task, which required creative/flexible thinking, but not on an analogical reasoning task, which required both rigid and flexible thinking. The results suggest the hardness experience affects cognitive functions that are metaphorically associated with rigidity or flexibility. They support the embodiment proposition that cognitive functions and representations can be grounded in bodily states via metaphorical associations. PMID:27672373

Ultrasoft and High Magnetic Moment CoFe Films Directly Electrodeposited from a B-Reducer Contained Solution

Directory of Open Access Journals (Sweden)

Baoyu Zong

2008-01-01

Full Text Available A methodology to fabricate ultrasoft CoFe nano-/microfilms directly via electrodeposition from a semineutral iron sulfate solution is demonstrated. Using boron-reducer as the additive, the CoFe films become very soft with high magnetic moment. Typically, the film coercivity in the easy and hard axes is 6.5 and 2.5 Oersted, respectively, with a saturation polarization up to an average of 2.45 Tesla. Despite the softness, these shining and smooth films still display a high-anisotropic field of ~45 Oersted with permeability up to 104. This kind of films can potentially be used in current and future magnetic recording systems as well as microelectronic and biotechnological devices.

Microstructure and mechanical properties of Zr-Si-N films prepared by rf-reactive sputtering

CERN Document Server

Nose, M; Zhou, M; Mae, T; Meshii, M

2002-01-01

ZrN and ZrSiN films were prepared in an rf sputtering apparatus that has a pair of targets facing each other (referred to as the facing target--type rf sputtering). Films were deposited on silicon wafers without bias application or substrate heating in order to examine only the effect of silicon addition to the transition metal nitride films. The contents of zirconium, nitrogen, and silicon of the films were determined with an electron probe microanalyzer. The transmission electron microscopy studies were carried out in addition to x-ray diffraction. For the high resolution transmission electron microscopy observation, the field emission type transmission electron microscope was used, which provides a point-to-point resolution of 0.1 nm. The samples were observed both parallel and perpendicular to the film surface, which were plane and cross sectional views, respectively. In order to investigate the relationship between the mechanical properties and microstructure of films, the hardness was measured by a nano...

Effect of ion nitridation process on hardness and the corrosion resistance of biomaterials

International Nuclear Information System (INIS)

Wirjoadi; Lely Susita; Bambang Siswanto; Sudjatmoko

2012-01-01

Ion nitriding process has been performed on metal biomaterials to improve their mechanical properties of materials, particularly to increase hardness and corrosion resistance. This metallic biomaterials used for artificial bone or a prosthetic graft and used as devices of orthopedic biomaterials are usually of 316L SS metal-type and Ti-6Al-4V alloy. The purpose of this study is to research the development and utilization of ion nitridation method in order to get iron and titanium nitride thin films on the metallic biomaterials for artificial bone that has wear resistance and corrosion resistance is better. Microhardness of the samples was measured using a microhardness tester, optimum hardness of SS 316L samples are about 582 VHN, this was obtained at the nitriding temperature of 500 °C, the nitriding time of 3 hours and the nitrogen gas pressure of 1.6 mbar, while optimum hardness of Ti-6Al-4V alloy is 764 VHN, this was obtained at the nitriding temperature of 500 °C, the nitriding time of 4 hours and the nitrogen gas pressure of 1.6 mbar. The hardness value of SS 316L sample and Ti-6Al-4V alloy increase to 143% and 153%, if compared with standard samples. The optimum corrosion resistance at temperature of 350 °C for SS 316L and Ti-6Al-4V are 260,12 and 110,49 μA/cm 2 or corrosion rate are 29,866 and 15,189 mpy, respectively. (author)

Studies on the properties of poly (ethylene oxide) R-150 hydrogel films formed by irradiation graft

International Nuclear Information System (INIS)

Yang Zhanshan; Zhu Nankang; Yang Shuqin; Qiang Yizhong

1999-01-01

In order to improve the mechanical properties of poly (ethylene oxide) (PEO) hydrogel film was used as wound dressing. The chemical and physical properties of the PEO R-150 graft hydrogel film formed by blends of electron beam irradiated-PEO R-150 and poly(vinyl alcohol) (PVA) were studied. The experimental results showed that the crosslinking densities of the PEO R-150 graft hydrogel increased along with the increasing of the irradiation doses and decreased with the increasing of the blend concentrations. While the PVA graft proportions did not produce obvious effects on the crosslinking density of the graft hydrogel. The crosslinking density of the graft hydrogel were obviously lower than that of the pure PVA hydrogel. The equilibrium water content of the graft hydrogel decrease as the irradiation dose and the PVA graft proportion increased; but they increased as the blend concentration increased. The equilibrium water content of the graft hydrogel was obviously higher than those of the pure PVA hydrogel. The hardness of the PVA hydrogel film increased with the irradiation dose. The hardness of the graft hydrogel decreased with the blend concentration, whereas it increased with the PVA graft proportion. The results suggest the PVA produces a main effect on the crosslinking density of the graft hydrogel, the PEO R-150 produces a main effect on the equilibrium water content of the graft hydrogel, and the both polymers have double effects on the hardness of the graft hydrogel

Microbridge tests on gallium nitride thin films

International Nuclear Information System (INIS)

Huang, Hai-You; Li, Zhi-Ying; Lu, Jun-Yong; Wang, Zhi-Jia; Zhang, Tong-Yi; Wang, Chong-Shun; Lau, Kei-May; Chen, Kevin Jing

2009-01-01

In this work, we develop further the microbridge testing method by deriving a closed formula of deflection versus load, which is applied at an arbitrary position on the microbridge beam. Testing a single beam at various positions allows us to characterize simultaneouslyYoung's modulus and residual stress of the beam. The developed method was then used to characterize the mechanical properties of GaN thin films on patterned-Si (1 1 1) substrates grown by metal organic chemical vapor deposition (MOCVD). The microbridge samples were fabricated by using the microelectromechanical fabrication technique and tested with a nanoindentation system. Young's modulus and residual stress of the GaN films were determined to be 287 ± 190 GPa and 851 ± 155 MPa, respectively. In addition, alternative measurements of the residual stress, Young's modulus and hardness of the GaN films, were conducted with micro-Raman spectroscopy and the nanoindentation test, yielding the corresponding values of 847 ± 46 MPa, 269.0 ± 7.0 GPa and 17.8 ± 1.1 GPa

KMCThinFilm: A C++ Framework for the Rapid Development of Lattice Kinetic Monte Carlo (kMC) Simulations of Thin Film Growth

Science.gov (United States)

2015-09-01

direction, so if the simulation domain is set to be a certain size, then that presents a hard ceiling on the thickness of a film that may be grown in...FFA, Los J, Cuppen HM, Bennema P, Meekes H. MONTY:  Monte Carlo crystal growth on any crystal structure in any crystallographic orientation...mhoffman.github.io/kmos/. 23. Kiravittaya S, Schmidt OG. Quantum-dot crystal defects. Applied Physics Letters. 2008;93:173109. 24. Leetmaa M

Fabrication of Si3N4 thin films on phynox alloy substrates for electronic applications

Science.gov (United States)

Shankernath, V.; Naidu, K. Lakshun; Krishna, M. Ghanashyam; Padmanabhan, K. A.

2018-04-01

Thin films of Si3N4 are deposited on Phynox alloy substrates using radio frequency magnetron sputtering. The thickness of the films was varied between 80-150 nm by increasing the duration of deposition from 1 to 3 h at a fixed power density and working pressure. X-ray diffraction patterns reveal that the Si3N4 films had crystallized inspite of the substrates not being heated during deposition. This was confirmed using selected area electron diffraction and high resolution transmission electron microscopy also. It is postulated that a low lattice misfit between Si3N4 and Phynox provides energetically favourable conditions for ambient temperature crystallization. The hardness of the films is of the order of 6 to 9 GPa.

SU-F-T-493: An Investigation Into the Feasibility of Using PipsPro Software with Film for Linac QA

International Nuclear Information System (INIS)

Underwood, R

2016-01-01

Purpose: To determine the feasibility of using radiochromic and radiographic film with Pipspro software for quality assurance of linear accelerators with no on-board imaging. Methods: The linear accelerator being used is a Varian Clinac 21EX. All IGRT is performed using the BrainLab ExacTrac system. Because of the lack of on board imaging, certain monthly and annual TG-142 quality assurance tests are more difficult to perform and analyze to a high degree of accuracy. Pipspro was not designed to be used with hard film, and to our knowledge its use with film had not been investigated. The film used will be GafChromic EBT3 film and Kodak EDR2 film, scanned with an Epson V700 scanner. The following routine tests will be attempted: MLC picket fence, light vs. radiation field coincidence, starshots, and MLC transmission. Results: The only tests that gave accurate and reliable results were the couch, gantry, and collimator starshots. Typical MV and kV images are acquired with a much higher level of contrast between the irradiated and non-irradiated areas when compared to film. Pipspro relies on this level of contrast to be able to automatically detect the fiducial points from its phantom devices, leaf edges for picket fence and transmission tests, and jaw edges for light vs. radiation field tests. Because of this, certain tests gave erroneous results and others were not able to be performed in the software at all, with either type of film. The number of monitor units delivered to the film, the experimental setup, and the scan settings was not able to rectify the problem. Conclusion: For linear accelerators with no on-board imaging, it is not recommended to use hard film with PipsPro to perform TG-142 quality assurance tests. Other software or methods should instead be investigated.

Microbiological quality of soft, semi-hard and hard cheeses during the shelf-life

Directory of Open Access Journals (Sweden)

Josip Vrdoljak

2016-03-01

Full Text Available Cheeses as ready-to-eat food should be considered as a potential source of foodborne pathogens, primarily Listeria monocytogenes. The aim of present study was to determine the microbiological quality of soft, semi-hard and hard cheeses during the shelf-life, with particular reference to L. monocytogenes. Five types of cheeses were sampled at different timepoints during the cold storage and analyzed for presence of Salmonella and L. monocytogenes, as well as lactic acid bacteria, Escherichia coli, coagulase-positive staphylococci, yeasts, molds, sulfite-reducing clostridia and L. monocytogenes counts. Water activity, pH and NaCl content were monitored in order to evaluate the possibility of L. monocytogenes growth. Challenge test for L. monocytogenes was performed in soft whey cheese, to determine the growth potential of pathogen during the shelf-life of product. All analyzed cheeses were compliant with microbiological criteria during the shelf-life. In soft cheeses, lactic acid bacteria increased in the course of the shelf-life period (1.2-2.6 log increase, while in semi-hard and hard cheeses it decreased (1.6 and 5.2 log decrease, respectively. Soft cheeses support the growth of L. monocytogenes according to determined pH values (5.8-6.5, water activity (0.99-0.94, and NaCl content (0.3-1.2%. Challenge test showed that L. monocytogenes growth potential in selected soft cheese was 0.43 log10 cfu/g during 8 days at 4°C. Water activity in semi-hard and hard cheeses was a limiting factor for Listeria growth during the shelf-life. Soft, semi-hard and hard cheeses were microbiologically stable during their defined shelf-life. Good manufacturing and hygienic practices must be strictly followed in the production of soft cheeses as Listeria-supporting food and be focused on preventing (recontamination.

Locally resolved investigation of wedged Cu(In,Ga)Se{sub 2} films prepared by physical vapor deposition using hard X-ray photoelectron and X-ray fluorescence spectroscopy

Energy Technology Data Exchange (ETDEWEB)

Calvet, Wolfram, E-mail: wolfram.calvet@helmholtz-berlin.de [Helmholtz-Zentrum Berlin, Hahn-Meitner-Platz 1, D-14109 Berlin (Germany); Ümsür, Bünyamin; Höpfner, Britta; Lauermann, Iver; Prietzel, Karsten; Kaufmann, Christan A.; Unold, Thomas [Helmholtz-Zentrum Berlin, Hahn-Meitner-Platz 1, D-14109 Berlin (Germany); Lux-Steiner, Martha C. [Helmholtz-Zentrum Berlin, Hahn-Meitner-Platz 1, D-14109 Berlin (Germany); Freie Universität Berlin, Department of Physics, Arnimallee 14, D-14195 Berlin (Germany)

2015-05-01

We have investigated a specially grown Cu(In,Ga)Se{sub 2} (CIGSe) absorber, which was deposited by co-evaporation of Cu, In, Ga, and Se using a modified three stage process. Prior to the growth, the molybdenum-coated glass substrate was covered by a bent shroud made from tantalum (Ta), leading to a wedged absorber structure with a width of about 2 mm where the film thickness varies from 0 to 2 μm. In this region of interest the thickness dependency of morphology, concentration ratios and electronic properties was studied with secondary electron microscopy (SEM), X-ray fluorescence (XRF) and hard X-ray photoelectron spectroscopy (HAXPES), probing the CIGSe sample along the thickness gradient. The evidence of the thickness gradient itself was proven with SEM measurements in cross section geometry. By using XRF it was found that with decreasing film thickness the Cu concentration decreases significantly. This finding was also verified by HAXPES measurements. Furthermore, an enrichment of Ga towards the Mo back contact was found using the same technique. Besides these results the formation of a molybdenum selenide (MoSe) phase was observed on the fully covered part of the Mo coated substrate indicating a high mobility of Se on Mo under the given temperature conditions of the modified three stage deposition process. - Highlights: • Growth of a CIGSe wedge • Application of HAXPES and XRF as local probing techniques • Good agreement with former studies • Wedged CIGSe structures can be used for further, locally resolved experiments.

Analytical Modeling of Hard-Coating Cantilever Composite Plate considering the Material Nonlinearity of Hard Coating

Directory of Open Access Journals (Sweden)

Wei Sun

2015-01-01

Full Text Available Due to the material nonlinearity of hard coating, the coated structure produces the nonlinear dynamical behaviors of variable stiffness and damping, which make the modeling of hard-coating composite structure become a challenging task. In this study, the polynomial was adopted to characterize this material nonlinearity and an analytical modeling method was developed for the hard-coating composite plate. Firstly, to relate the hard-coating material parameters obtained by test and the analytical model, the expression of equivalent strain of composite plate was derived. Then, the analytical model of hard-coating composite plate was created by energy method considering the material nonlinearity of hard coating. Next, using the Newton-Raphson method to solve the vibration response and resonant frequencies of composite plate and a specific calculation procedure was also proposed. Finally, a cantilever plate coated with MgO + Al2O3 hard coating was chosen as study case; the vibration response and resonant frequencies of composite plate were calculated using the proposed method. The calculation results were compared with the experiment and general linear calculation, and the correctness of the created model was verified. The study shows the proposed method can still maintain an acceptable precision when the material nonlinearity of hard coating is stronger.

Deposition of diamond-like carbon films by plasma source ion implantation with superposed pulse

International Nuclear Information System (INIS)

Baba, K.; Hatada, R.

2003-01-01

Diamond-like carbon (DLC) films were prepared on silicon wafer substrate by plasma source ion implantation with superposed negative pulse. Methane and acetylene gases were used as working gases for plasma. A negative DC voltage and a negative pulse voltage were superposed and applied to the substrate holder. The DC voltage was changed in the range from 0 to -4 kV and the pulse voltage was changed from 0 to -18 kV. The surface of DLC films was very smooth. The deposition rate of DLC films increased with increasing in superposed DC bias voltage. Carbon ion implantation was confirmed for the DLC film deposited from methane plasma with high pulse voltage. I D /I G ratios of Raman spectroscopy were around 1.5 independent on pulse voltage. The maximum hardness of 20.3 GPa was observed for the film prepared with high DC and high pulse voltage

Structural and nanomechanical properties of nanocrystalline carbon thin films for photodetection