Protection of yttria-stabilized zirconia for dental applications by oxidic PVD coating.

Science.gov (United States)

Hübsch, C; Dellinger, P; Maier, H J; Stemme, F; Bruns, M; Stiesch, M; Borchers, L

2015-01-01

In this study, the application of transparent physical vapor deposition (PVD) coatings on zirconia ceramics was examined as an approach to retard the low-temperature degradation of zirconia for dental applications. Transparent monolayers of titanium oxide (TixOy) and multilayers consisting of titanium oxide-alumina-titanium oxide (TixOy-AlxOy-TixOy) were deposited onto standardized discs of 3Y-TZP using magnetron sputtering. Using X-ray photospectroscopy and time-of-flight secondary-ion mass spectrometry, the compositions of the coatings were verified, and an approximate thickness of 50 nm for each type of coating was ascertained. After aging the coated and uncoated samples in water vapor at 134°C and 3 bar for 4, 8, 16, 32, 64 and 128 h, the monoclinic phase content was determined using X-ray diffraction, and its impact on mechanical properties was assessed in biaxial flexural strength tests. In addition, the depth of the transformation zone was measured from scanning electron microscopy images of the fracture surfaces of hydrothermally aged samples. The results revealed that the tetragonal-to-monoclinic phase transformation of the zirconia ceramic was retarded by the application of PVD coatings. During the first stages of aging, the coated samples exhibited a significantly lower monoclinic phase content than the uncoated samples and, after 128 h of aging, showed a transformation zone which was only ∼12-15 μm thick compared to ∼30 μm in the control group. Biaxial flexural strength decreased by ∼10% during aging and was not influenced by the application of a PVD coating. Copyright © 2014 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

Domino Platform: PVD Coaters for Arc Evaporation and High Current Pulsed Magnetron Sputtering

International Nuclear Information System (INIS)

Vetter, J; Müller, J; Erkens, G

2012-01-01

AlTiN and CrN coatings were deposited in hybrid DOMINO platforms by magnetron sputtering (DC-MS, DC-MS+HCP-MS, HCP-MS) and vacuum arc evaporation. The ion cleaning was done by the AEGD process. The coating rates and the energy efficiency of both deposition processes were compared. The roughness effects of the different coating types were discussed. Preliminary results of the change of pulse characteristics during simultaneously running of HCP-MS plus vacuum arc evaporation are shown.

AlN/Al dual protective coatings on NdFeB by DC magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Li Jinlong; Mao Shoudong; Sun Kefei [Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China); Li Xiaomin [Shanghai Institute of Ceramics Chinese Academy of Sciences, Shanghai 200050 (China); Song Zhenlun [Zhejiang Province Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China)], E-mail: songzhenlun@nimte.ac.cn

2009-11-15

AlN/Al dual protective coatings were prepared on NdFeB by DC magnetron sputtering in a home-made industrial apparatus. Comparing with Al coating, AlN/Al coatings have a denser structure of an outmost AlN amorphous layer following an inner Al columnar crystal layer. The coatings and NdFeB substrate combine well, and moreover, there is occurrence of metallurgy bonding in the interface layer. Both Al and AlN/Al coatings have a good protective ability to NdFeB. Especially, the corrosion resistance of AlN/Al coated NdFeB is improved largely. AlN/Al and Al protective coatings not only do not deteriorate the magnetic properties of NdFeB, but contribute to their slight increase.

AlN/Al dual protective coatings on NdFeB by DC magnetron sputtering

International Nuclear Information System (INIS)

Li Jinlong; Mao Shoudong; Sun Kefei; Li Xiaomin; Song Zhenlun

2009-01-01

AlN/Al dual protective coatings were prepared on NdFeB by DC magnetron sputtering in a home-made industrial apparatus. Comparing with Al coating, AlN/Al coatings have a denser structure of an outmost AlN amorphous layer following an inner Al columnar crystal layer. The coatings and NdFeB substrate combine well, and moreover, there is occurrence of metallurgy bonding in the interface layer. Both Al and AlN/Al coatings have a good protective ability to NdFeB. Especially, the corrosion resistance of AlN/Al coated NdFeB is improved largely. AlN/Al and Al protective coatings not only do not deteriorate the magnetic properties of NdFeB, but contribute to their slight increase.

Iron-regulated transcription of the pvdA gene in Pseudomonas aeruginosa: effect of Fur and PvdS on promoter activity.

OpenAIRE

Leoni, L; Ciervo, A; Orsi, N; Visca, P

1996-01-01

The pvdA gene, encoding the enzyme L-ornithine N5-oxygenase, catalyzes a key step of the pyoverdin biosynthetic pathway in Pseudomonas aeruginosa. Expression studies with a promoter probe vector made it possible to identify three tightly iron-regulated promoter regions in the 5.9-kb DNA fragment upstream of pvdA. The promoter governing pvdA expression was located within the 154-bp sequence upstream of the pvdA translation start site. RNA analysis showed that expression of PvdA is iron regulat...

Development and evaluation of two PVD-coated β-titanium orthodontic archwires for fluoride-induced corrosion protection.

Science.gov (United States)

Krishnan, Vinod; Krishnan, Anand; Remya, R; Ravikumar, K K; Nair, S Asha; Shibli, S M A; Varma, H K; Sukumaran, K; Kumar, K Jyothindra

2011-04-01

The present research was aimed at developing surface coatings on β titanium orthodontic archwires capable of protection against fluoride-induced corrosion. Cathodic arc physical vapor deposition PVD (CA-PVD) and magnetron sputtering were utilized to deposit thin films of titanium aluminium nitride (TiAlN) and tungsten carbide/carbon (WC/C) coatings on β titanium orthodontic archwires. Uncoated and coated specimens were immersed in a high fluoride ion concentration mouth rinse, following a specially designed cycle simulating daily use. All specimens thus obtained were subjected to critical evaluation of parameters such as electrochemical corrosion behaviour, surface analysis, mechanical testing, microstructure, element release, and toxicology. The results confirm previous research that β titanium archwires undergo a degradation process when in contact with fluoride mouth rinses. The study confirmed the superior nature of the TiAlN coating, evident as many fewer changes in properties after fluoride treatment when compared with the WC/C coating. Thus, coating with TiAlN is recommended in order to reduce the corrosive effects of fluorides on β titanium orthodontic archwires. Copyright © 2010 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

Composite Layers “MgAl Intermetalic Layer / PVD Coating” Obtained On The AZ91D Magnesium Alloy By Different Hybrid Surface Treatment Methods

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Smolik J.

2015-06-01

Full Text Available Magnesium alloys have very interesting physical properties which make them ‘materials of the future’ for tools and machine components in many industry areas. However, very low corrosion and tribological resistance of magnesium alloys hampers the implementation of this material in the industry. One of the methods to improve the properties of magnesium alloys is the application of the solutions of surface engineering like hybrid technologies. In this paper, the authors compare the tribological and corrosion properties of two types of “MgAlitermetalic / PVD coating” composite layers obtained by two different hybrid surface treatment technologies. In the first configuration, the “MgAlitermetalic / PVD coating” composite layer was obtained by multisource hybrid surface treatment technology combining magnetron sputtering (MS, arc evaporation (AE and vacuum heating methods. The second type of a composite layer was prepared using a hybrid technology combined with a diffusion treatment process in Al-powder and the electron beam evaporation (EB method. The authors conclude, that even though the application of „MgAlitermetalic / PVD coating” composite layers can be an effective solution to increase the abrasive wear resistance of magnesium alloys, it is not a good solution to increase its corrosion resistance.

Methods to improve the PVD coatability of brass by using diffusion barriers

Science.gov (United States)

Langer, Bernd

Previous work involving PVD coatings on brass has used a combination of multilayers consisting of electroplated films like nickel or chromium and deposited decorative PVD coatings like TiN, TiAIN or ZrN systems. The disadvantages of these systems are the combination of wet electrochemistry and high tech vacuum processes. Furthermore the allergic reaction to nickel and the toxic nature of Cr(VI) must be considered.There is a need for intermediate layers to 'seal-off the brass in order to avoid the evaporation of zinc in vacuum using a diffusion barrier. Furthermore the intermediate layers are required to act as a corrosion barrier.This thesis reports on the development of PVD coatings on heat sensitive brass substrate materials utilising ABS technology with Al, CuAl8 and Nb targets as vapour sources.The brass pretreatment includes careful grinding, polishing and cleaning steps as well as steered arc metal ion etching using the above target materials. The coatings are produced at temperatures between 100 and 250°C in the unbalanced magnetron mode, including layers made from Al, Al-Nb, CuA18, CuAl8-Nb and Nb.Scratch adhesion and Rockwell indentation tests are found not to be directly applicable to the system of soft brass and ductile coating(s). Therefore a new classification for both scratch and indentation tests was defined. The best adhesion was shown by the CuA18 coatings on brass. Corrosion tests showed good results for the Al coatings and poor results for the pure Nb coatings directly applied on brass. The best corrosion result was obtained with a CuAl8-Nb layer system. This layer system also offers very good barrier behaviour concerning Zn diffusion.Other investigations like Glow Discharge Optical Emission Spectroscopy (GDOES), Scanning Electron Microscopy (SEM) imaging, Transmission Electron Microscopy (TEM) and X-ray Diffraction (XRD) were undertaken to characterise the new coating systems for brass.

Raman microscopic studies of PVD deposited hard ceramic coatings

International Nuclear Information System (INIS)

Constable, C.P.

2000-01-01

PVD hard ceramic coatings grown via the combined cathodic arc/unbalance magnetron deposition process were studied using Raman microscopy. Characteristic spectra from binary, multicomponent, multilayered and superlattice coatings were acquired to gain knowledge of the solid-state physics associated with Raman scattering from polycrystalline PVD coatings and to compile a comprehensive spectral database. Defect-induced first order scattering mechanisms were observed which gave rise to two pronounced groups of bands related to the acoustical (150- 300cm -1 ) and optical (400-7 50cm -1 ) parts of the phonon spectrum. Evidence was gathered to support the theory that the optic modes were mainly due to the vibrations of the lighter elements and the acoustic modes due to the vibrations of the heavier elements within the lattice. A study into the deformation and disordering on the Raman spectral bands of PVD coatings was performed. TiAIN and TiZrN coatings were intentionally damaged via scratching methods. These scratches were then analysed by Raman mapping, both across and along, and a detailed spectral interpretation performed. Band broadening occurred which was related to 'phonon relaxation mechanisms' as a direct result of the breaking up of coating grains resulting in a larger proportion of grain boundaries per-unit-volume. A direct correlation of the amount of damage with band width was observed. Band shifts were also found to occur which were due to the stresses caused by the scratching process. These shifts were found to be the largest at the edges of scratches. The Raman mapping of 'droplets', a defect inherent to PVD deposition processes, found that higher compressive stresses and large amounts of disorder occurred for coating growth onto droplets. Strategies designed to evaluate the ability of Raman microscopy to monitor the extent of real wear on cutting tools were evaluated. The removal of a coating layer and subsequent detection of a base layer proved

The microstructure and properties of unbalanced magnetron sputtered CrNx coatings

International Nuclear Information System (INIS)

Hurkmans, Antonius Petrus Arnoldus

2002-01-01

The most widely used surface treatment to protect engineering components is the deposition of hard chromium by electroplating. The coatings are known to be quite thick (up to 20 μm), reasonably hard (∼HV1000), but contain micro-cracks. This wet deposition process is well understood, but it has technical limitations and is under high political pressure because of the environmental pollution by hexavalent chromium. The physical vapour deposition (PVD) technique is an alternative method to produce high quality coatings. PVD is an almost pollution free technique, because the process occurs under vacuum. CrN by PVD is one of the most promising PVD coatings as a candidate to replace eventually electroplated hard chromium. The growth characteristics of CrN coatings are less understood than those of TiN, the well-known PVD coating material. This thesis anticipates to fill this technological gap. Along a wide range of experiments based on the deposition of CrN x coatings, XRD, SEM, SNMS and tribological analysis have been used to complete a thorough understanding of CrN x growth. The experiments show that there exist several different phases within the Cr-N system: bcc-Cr, hcp-Cr 2 N, fcc-CrN, and mixed phases. This is not fundamentally new, but the work has resulted in two new modifications, which are highly interesting candidates for the industry, including electroplating replacements, namely high nitrogen containing metallic bcc-Cr (solid solution with up to 18 at.% nitrogen) in the hardness range up to HV1800 and a very hard fcc-CrN phase with hardness values between HV1500 and HV3000, similar to TiN. The solid solution bcc-Cr-N is very dense fine-grained, reasonably hard (almost twice as hard as electroplated hard chromium), very smooth, and with a Young's modulus very similar to that of (hardened) steel. The hard fcc-CrN phase (approximately three times harder than electroplated hard chromium) could only be obtained by the current experiments in a rather non

PVD Silicon Carbide as a Thin Film Packaging Technology for Antennas on LCP Substrates for Harsh Environments

Science.gov (United States)

Scardelletti, Maximilian C.; Stanton, John W.; Ponchak, George E.; Jordan, Jennifer L.; Zorman, Christian A.

2010-01-01

This paper describes an effort to develop a thin film packaging technology for microfabricated planar antennas on polymeric substrates based on silicon carbide (SiC) films deposited by physical vapor deposition (PVD). The antennas are coplanar waveguide fed dual frequency folded slot antennas fabricated on liquid crystal polymer (LCP) substrates. The PVD SiC thin films were deposited directly onto the antennas by RF sputtering at room temperature at a chamber pressure of 30 mTorr and a power level of 300 W. The SiC film thickness is 450 nm. The return loss and radiation patterns were measured before and after the SiC-coated antennas were submerged into perchloric acid for 1 hour. No degradation in RF performance or physical integrity of the antenna was observed.

Structure and corrosion properties of PVD Cr-N coatings

CERN Document Server

Liu, C; Ziegele, H; Leyland, A; Matthews, A

2002-01-01

PVD Cr-N coatings produced by physical vapor deposition (PVD) are increasingly used for mechanical and tribological applications in various industrial sectors. These coatings are particularly attractive for their excellent corrosion resistance, which further enhances the lifetime and service quality of coated components. PVD Cr-N coated steels in an aqueous solution are usually corroded by galvanic attack via through-coating 'permeable' defects (e.g., pores). Therefore, the corrosion performance of Cr-N coated steel is determined by a number of variables of the coating properties and corrosive environment. These variables include: (i) surface continuity and uniformity; (ii) through-coating porosity; (iii) film density and chemical stability; (iv) growth stresses; (v) interfacial and intermediate layers; (vi) coating thickness; (vii) coating composition; and (viii) substrate properties. In this article, PVD Cr-N coatings were prepared, by electron-beam PVD and sputter deposition, with different compositions, t...

Computer Simulation of the Relationship between Selected Properties of PVD Coatings

Directory of Open Access Journals (Sweden)

Śliwa A.

2016-06-01

Full Text Available The possibility to apply the Finite Element Method to calculate internal stresses which occur in Ti+TiN, Ti+Ti(CxN1-x and Ti+TiC coatings obtained in the magnetron PVD process on the sintered high-speed steel of the PM HS6-5-3-8 type. For the purpose of computer simulation of internal stresses in coatings with the use of MES, the correct model of analyzed specimens was worked out and then it was experimentally verified by comparison of calculation results with the results of computer simulation. Accurate analysis of correlations indicated especially strong dependence between internal stresses and microhardness and between microhardness and erosion resistance what created conditions for establishing the dependence between internal stresses obtained in the result of computer simulation and erosion resistance as basic functional quality of coating. It has essential practical meaning because it allows to estimate predictable erosion resistance of coating exclusively on the base of the results of computer simulation for used parameters in the process of coating manufacturing.

Nanograined Net-Shaped Fabrication of Rhenium Components by EB-PVD

International Nuclear Information System (INIS)

Singh, Jogender; Wolfe, Douglas E.

2004-01-01

Cost-effective net-shaped forming components have brought considerable interest into DoD, NASA and DoE. Electron beam physical vapor deposition (EB-PVD) offers flexibility in forming net-shaped components with tailored microstructure and chemistry. High purity rhenium (Re) components including rhenium-coated graphite balls, Re- plates and tubes have been successfully manufactured by EB-PVD. EB-PVD Re components exhibited sub-micron and nano-sized grains with high hardness and strength as compared to CVD. It is estimated that the cost of Re components manufactured by EB-PVD would be less than the current CVD and powder-HIP Technologies

Variable Power, Short Microwave Pulses Generation using a CW Magnetron

Directory of Open Access Journals (Sweden)

CIUPA, R.

2011-05-01

Full Text Available Fine control of microwave power radiation in medical and scientific applications is a challenging task. Since a commercial Continuous Wave (CW magnetron is the most inexpensive microwave device available today on the market, it becomes the best candidate for a microwave power generator used in medical diathermy and hyperthermia treatments or high efficiency chemical reactions using microwave reactors as well. This article presents a new method for driving a CW magnetron with short pulses, using a modified commercial Zero Voltage Switching (ZVS inverter, software driven by a custom embedded system. The microwave power generator designed with this method can be programmed for output microwave pulses down to 1% of the magnetron's power and allows microwave low frequency pulse modulation in the range of human brain electrical activity, intended for medical applications. Microwave output power continuous control is also possible with the magnetron running in the oscillating area, using a dual frequency Pulse Width Modulation (PWM, where the low frequency PWM pulse is modulating a higher resonant frequency required by the ZVS inverter's transformer. The method presented allows a continuous control of both power and energy (duty-cycle at the inverter's output.

Studies on the cross-magnetron effect in the reactive indium tin oxide deposition. Effects of an inhomogeneous plasma distribution on the coating properties in dynamic and static coating by means of a pulsed dual magnetron

International Nuclear Information System (INIS)

Kleinhempel, Ronny

2008-01-01

In the present thesis the reactive ITO deposition process under application of metallic In:Sn targets is intensively studied. The coating deposition pursues at a symmetric bipolarly pulsed dual magnetron both on resting and moving substrates. The thesis comprehends two partial fields. On the one hand the dynamic deposition process was comprehensively characterized at an near-industry test facility and successfully transformed by means of its physical parameters to an industrial coating facility. On the other hand static depositions were performed. These allow the analysis of the lateral distribution of the functional coating properties. By this a correlation to the lateral distributions of the measured plasma parameters could be elaborated [de

PVD TBC experience on GE aircraft engines

Science.gov (United States)

Maricocchi, Antonio; Bartz, Andi; Wortman, David

1995-01-01

The higher performance levels of modern gas turbine engines present significant challenges in the reliability of materials in the turbine. The increased engine temperatures required to achieve the higher performance levels reduce the strength of the materials used in the turbine sections of the engine. Various forms of thermal barrier coatings (TBC's) have been used for many years to increase the reliability of gas turbine engine components. Recent experience with the physical vapor deposition (PVD) process using ceramic material has demonstrated success in extending the service life of turbine blades and nozzles. Engine test results of turbine components with a 125 micron (0.005 in) PVD TBC have demonstrated component operating temperatures of 56-83 C (100-150 F) lower than non-PVD TBC components. Engine testing has also revealed the TBC is susceptible to high angle particle impact damage. Sand particles and other engine debris impact the TBC surface at the leading edge of airfoils and fracture the PVD columns. As the impacting continues, the TBC erodes away in local areas. Analysis of the eroded areas has shown a slight increase in temperature over a fully coated area, however a significant temperature reduction was realized over an airfoil without TBC.

Surface coatings deposited by CVD and PVD

International Nuclear Information System (INIS)

Gabriel, H.M.

1982-01-01

The demand for wear and corrosion protective coatings is increasing due to economic facts. Deposition processes in gas atmospheres like the CVD and PVD processes attained a tremendous importance especially in the field of the deposition of thin hard refractory and ceramic coatings. CVD and PVD processes are reviewed in detail. Some examples of coating installations are shown and numerous applications are given to demonstrate the present state of the art. (orig.) [de

PVD following plasmin but not hyaluronidase: implications for combination pharmacologic vitreolysis therapy.

Science.gov (United States)

Wang, Zhi-Liang; Zhang, Xi; Xu, Xun; Sun, Xiao-Dong; Wang, Fang

2005-01-01

To study whether intravitreal injection of plasmin + hyaluronidase safely induces posterior vitreous detachment (PVD). Rabbits were randomized into three groups: (A) 20 rabbits, intravitreal injection of plasmin 1 U + hyaluronidase 20 U in balanced salt solution (BSS) 0.1 mL into one eye; (B) 12 rabbits, plasmin alone; (C) 12 rabbits, hyaluronidase alone. The fellow eye of each rabbit was injected BSS 0.1 mL. In Group A, scanning electron microscopy (SEM) was done in four rabbits at 0.5 hour and in four rabbits at 1 hour. After 7 days, all the remaining 36 rabbits received electroretinography, SEM was examined in eight of each group, and immunohistochemistry was done in four of each group. SEM disclosed the eyes of Group A had complete PVD (8/8), Group B partial PVD (7/8), and Group C (8/8) and all the control eyes (24/24) no PVD after 7 days. Partial PVD was found in 4/4 at 0.5 hour and complete PVD was seen in 3/4 at 1 hour in Group A. Immunohistochemistry showed that the amounts of laminin and fibronectin in the vitreoretinal interface were decreased in Group A and B versus the control eyes (P 0.05). Electroretinography showed no changes in any group (P >0.05). Vitreous injection of plasmin + hyaluronidase induced complete PVD with no obvious toxicity. Plasmin induced partial PVD, but hyaluronidase had no effects.

Corrosion behaviour of Arc-PVD coatings and hybrid systems

International Nuclear Information System (INIS)

Reichel, K.

1992-01-01

To achieve a comprehensive protective effect against corrosion and wear stresses, coating systems are increasingly being developed, in which there is a separation of the tasks of the coating materials regarding the protective effect. On the one hand, pure PVD coating systems are used, on the other hand hybrid coatings are examined, where galvanic processes are combined with PVD technique. The results of experiments introduced in this article were determined on Arc-PVD coatings. By this process, titanium nitride and chromium nitride coatings are both deposited directly on the basic material and are also deposited as combination coatings of Ti/TiN and chemical nickel/TiN. (orig.) [de

Properties of Co-deposited indium tin oxide and zinc oxide films using a bipolar pulse power supply and a dual magnetron sputter source

International Nuclear Information System (INIS)

Hwang, Man-Soo; Seob Jeong, Heui; Kim, Won Mok; Seo, Yong Woon

2003-01-01

Multilayer coatings consisting of metal layers sandwiched between transparent conducting oxide layers are widely used for flat panel display electrodes and electromagnetic shield coatings for plasma displays, due to their high electrical conductivity and light transmittance. The electrical and optical properties of these multilayer films depend largely on the surface characteristics of the transparent conducting oxide thin films. A smoother surface on the transparent conducting oxide thin films makes it easier for the metal layer to form a continuous film, thus resulting in a higher conductivity and visible light transmittance. Indium tin oxide (ITO) and zinc oxide (ZnO) films were co-deposited using a dual magnetron sputter and a bipolar pulse power supply to decrease the surface roughness of the transparent conducting oxide films. The symmetric pulse mode of the power supply was used to simultaneously sputter an In 2 O 3 (90 wt %) : SnO 2 (10 wt %) target and a ZnO target. We varied the duty of the pulses to control the ratio of ITO : ZnO in the thin films. The electrical and optical properties of the films were studied, and special attention was paid to the surface roughness and the crystallinity of the films. By co-depositing ITO and ZnO at a pulse duty ratio of ITO:ZnO=45:45 using a dual magnetron sputter and a bipolar pulse power supply, we were able to obtain amorphous transparent conducting oxide films with a very smooth surface which had a Zn-rich buffer layer under a In-rich surface layer. All of the films exhibited typical electrical and optical properties of transparent conducting oxide films deposited at room temperature

Structure and corrosion properties of PVD Cr-N coatings

International Nuclear Information System (INIS)

Liu, C.; Bi, Q.; Ziegele, H.; Leyland, A.; Matthews, A.

2002-01-01

PVD Cr-N coatings produced by physical vapor deposition (PVD) are increasingly used for mechanical and tribological applications in various industrial sectors. These coatings are particularly attractive for their excellent corrosion resistance, which further enhances the lifetime and service quality of coated components. PVD Cr-N coated steels in an aqueous solution are usually corroded by galvanic attack via through-coating 'permeable' defects (e.g., pores). Therefore, the corrosion performance of Cr-N coated steel is determined by a number of variables of the coating properties and corrosive environment. These variables include: (i) surface continuity and uniformity; (ii) through-coating porosity; (iii) film density and chemical stability; (iv) growth stresses; (v) interfacial and intermediate layers; (vi) coating thickness; (vii) coating composition; and (viii) substrate properties. In this article, PVD Cr-N coatings were prepared, by electron-beam PVD and sputter deposition, with different compositions, thicknesses, and surface roughnesses, by changing the N 2 flow rate, applying multilayering techniques and changing the substrate finish prior to coating. The microstructure of such coatings is investigated by various analytical techniques such as glancing angle x-ray diffraction and scanning electron microscopy, which are also correlated with the corrosion performance of the coated steel. Both dc polarization and ac impedance spectroscopy were employed to investigate the corrosion resistance of Cr-N coated steel in a 0.5N NaCl solution. It has been found that the N 2 flow rate during reactive deposition strongly determines the microstructure of Cr-N coatings (due to the changing nitrogen content in the film) and can thus affect the corrosion resistance of coated systems. The surface finish of the steel substrate also affects the uniformity and coverage of PVD coatings; grooves and inclusions on the original substrate can raise the susceptibility of coated

Phase and Frequency Locked Magnetrons for SRF Sources

Energy Technology Data Exchange (ETDEWEB)

Neubauer, Michael [Muons, Inc.; Johnson, Rolland

2014-09-12

There is great potential for a magnetron power source that can be controlled both in phase and frequency. Such a power source could revolutionize many particle accelerator systems that require lower capital cost and/or higher power efficiency. Beyond the accelerator community, phase and frequency locked magnetons could improve radar systems around the world and make affordable phased arrays for wireless power transmission for solar powered satellites. This joint project of Muons, Inc., Fermilab, and L-3 CTL was supported by an STTR grant monitored by the Nuclear Physics Office of the DOE Office of Science. The object of the program was to incorporate ferrite materials into the anode of a magnetron and, with appropriate biasing of the ferrites, to maintain frequency lock and to allow for frequency adjustment of the magnetron without mechanical tuners. If successful, this device would have a dual use both as a source for SRF linacs and for military applications where fast tuning of the frequency is a requirement. In order to place the materials in the proper location, several attributes needed to be modeled. First the impact of the magnetron’s magnetic field needed to be shielded from the ferrites so that they were not saturated. And second, the magnetic field required to change the frequency of the magnetron at the ferrites needed to be shielded from the region containing the circulating electrons. ANSYS calculations of the magnetic field were used to optimize both of these parameters. Once the design for these elements was concluded, parts were fabricated and a complete test assembly built to confirm the predictions of the computer models. The ferrite material was also tested to determine its compatibility with magnetron tube processing temperatures. This required a vacuum bake out of the chosen material to determine the cleanliness of the material in terms of outgassing characteristics, and a subsequent room temperature test to verify that the characteristics of

Thermocyclic behaviour of microstructurally modified EB-PVD thermal barrier coatings

International Nuclear Information System (INIS)

Schulz, U.; Fritscher, K.; Raetzer-Scheibe, H.-J.; Kaysser, W.A.; Peters, M.

1997-01-01

This paper focuses on the combined effects of substrate temperature and rotation during electron-beam physical vapor deposition (EB-PVD) on the columnar microstructure of yttria partially stabilized zirconia (YPSZ) thermal barrier coatings. Diameter and degree of ordering of the columns and the density of the coatings are sensitive to the processing parameters. Results are discussed in the frame of common structural zone models for PVD processes. The models are extended to consider the rotational effect. EB-PVD YPSZ TBCs of different column diameters were deposited on top of an EB-PVD NiCoCrAlY bondcoat on IN 100 superalloy test bars. The performance of the TBCs was investigated in a cyclic oxidation furnace test rig between 1100 C and 130 C and in a burner rig under hot gas corrosion conditions at a maximum temperature of 900 C. Results showed a correlation between cyclic lifetime and the various microstructures of the TBCs. Samples having a non-regular arrangement of columns performed best in both tests. (orig.)

Improving the Wear Resistance of Moulds for the Injection of Glass Fibre–Reinforced Plastics Using PVD Coatings: A Comparative Study

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Francisco Silva

2017-02-01

Full Text Available It is well known that injection of glass fibre–reinforced plastics (GFRP causes abrasive wear in moulds’ cavities and runners. Physical vapour deposition (PVD coatings are intensively used to improve the wear resistance of different tools, also being one of the most promising ways to increase the moulds’ lifespan, mainly when used with plastics strongly reinforced with glass fibres. This work compares four different thin, hard coatings obtained using the PVD magnetron sputtering process: TiAlN, TiAlSiN, CrN/TiAlCrSiN and CrN/CrCN/DLC. The first two are monolayer coatings while the last ones are nanostructured and consist of multilayer systems. In order to carry out the corresponding tribological characterization, two different approaches were selected: A laboratorial method, using micro-abrasion wear tests based on a ball-cratering configuration, and an industrial mode, analysing the wear resistance of the coated samples when inserted in a plastic injection mould. As expected, the wear phenomena are not equivalent and the results between micro-abrasion and industrial tests are not similar due to the different means used to promote the abrasion. The best wear resistance performance in the laboratorial wear tests was attained by the TiAlN monolayer coating while the best performance in the industrial wear tests was obtained by the CrN/TiAlCrSiN nanostructured multilayer coating.

Recubrimientos por PVD decorativos sobre cerámicas

Directory of Open Access Journals (Sweden)

García, J. A.

2006-08-01

Full Text Available During the last years PVD coatings has been used for decorative purposes on ceramics and other substrates. Standards layers like TiN, CrN, TiCN, etc, give us the possibly of obtaining a wide range of colours, with a good mechanical, chemical properties. This paper gathers the works carried out in the Center of Advance Surface engineering of AIN during the three last years in the field of the decorative coatings. Different layer have been deposited by means of a METAPLAS 232 PVD equipment. A complete chemical and mechanical characterisation have been carried out on the different deposited layers like ultramicroindentation, scratch tests, wear resistance and GDOES.

En los últimos años se ha venido estudiado la aplicabilidad de las técnicas de depósitos mediante métodos físicos en fase vapor (PVD, para la realización de recubrimientos sobre cerámicas y otros substratos con fines decorativos. Los recubrimientos estándar por PVD como el TiN, CrN, TiCN, etc, ofrecen la posibilidad de conseguir acabados de apariencia metálica, de una amplia gama de colores, y con buenas propiedades mecánicas y químicas, como resistencia a la abrasión, estabilidad térmica, o resistencia a la corrosión. En este trabajo se recogen las experiencias realizadas en el recubrimiento y caracterización de cerámicas decorativas, durante los tres últimos años, en el Centro de Ingeniería de Superficies de la Asociación de la Industria Navarra. Los distintos tipos de recubrimientos se han realizado mediante un equipo de PVD modelo METAPLAS 232, con seis evaporadores de arco eléctrico y sistema de limpieza iónica patentado AEGD. Los recubrimientos han sido caracterizados, tanto química como mecánicamente, empleando las más modernas técnicas tribológicas (ultramicrodureza, scrascth tests, resistencia al desgaste... y espectroscópicas óptica por descarga luminiscente (GDOES. Los resultados obtenidos muestran que las técnicas de PVD son una

A chemically stable PVD multilayer encapsulation for lithium microbatteries

International Nuclear Information System (INIS)

Ribeiro, J F; Sousa, R; Cunha, D J; Vieira, E M F; Goncalves, L M; Silva, M M; Dupont, L

2015-01-01

A multilayer physical vapour deposition (PVD) thin-film encapsulation method for lithium microbatteries is presented. Lithium microbatteries with a lithium cobalt oxide (LiCoO 2 ) cathode, a lithium phosphorous oxynitride (LiPON) electrolyte and a metallic lithium anode are under development, using PVD deposition techniques. Metallic lithium film is still the most common anode on this battery technology; however, it presents a huge challenge in terms of material encapsulation (lithium reacts with almost any materials deposited on top and almost instantly begins oxidizing in contact with atmosphere). To prove the encapsulation concept and perform all the experiments, lithium films were deposited by thermal evaporation technique on top of a glass substrate, with previously patterned Al/Ti contacts. Three distinct materials, in a multilayer combination, were tested to prevent lithium from reacting with protection materials and atmosphere. These multilayer films were deposited by RF sputtering and were composed of lithium phosphorous oxide (LiPO), LiPON and silicon nitride (Si 3 N 4 ). To complete the long-term encapsulation after breaking the vacuum, an epoxy was applied on top of the PVD multilayer. In order to evaluate oxidation state of lithium films, the lithium resistance was measured in a four probe setup (cancelling wires/contact resistances) and resistivity calculated, considering physical dimensions. A lithium resistivity of 0.16 Ω μm was maintained for more than a week. This PVD multilayer exonerates the use of chemical vapour deposition (CVD), glove-box chambers and sample manipulation between them, significantly reducing the fabrication cost, since battery and its encapsulation are fabricated in the same PVD chamber. (paper)

A chemically stable PVD multilayer encapsulation for lithium microbatteries

Science.gov (United States)

Ribeiro, J. F.; Sousa, R.; Cunha, D. J.; Vieira, E. M. F.; Silva, M. M.; Dupont, L.; Goncalves, L. M.

2015-10-01

A multilayer physical vapour deposition (PVD) thin-film encapsulation method for lithium microbatteries is presented. Lithium microbatteries with a lithium cobalt oxide (LiCoO2) cathode, a lithium phosphorous oxynitride (LiPON) electrolyte and a metallic lithium anode are under development, using PVD deposition techniques. Metallic lithium film is still the most common anode on this battery technology; however, it presents a huge challenge in terms of material encapsulation (lithium reacts with almost any materials deposited on top and almost instantly begins oxidizing in contact with atmosphere). To prove the encapsulation concept and perform all the experiments, lithium films were deposited by thermal evaporation technique on top of a glass substrate, with previously patterned Al/Ti contacts. Three distinct materials, in a multilayer combination, were tested to prevent lithium from reacting with protection materials and atmosphere. These multilayer films were deposited by RF sputtering and were composed of lithium phosphorous oxide (LiPO), LiPON and silicon nitride (Si3N4). To complete the long-term encapsulation after breaking the vacuum, an epoxy was applied on top of the PVD multilayer. In order to evaluate oxidation state of lithium films, the lithium resistance was measured in a four probe setup (cancelling wires/contact resistances) and resistivity calculated, considering physical dimensions. A lithium resistivity of 0.16 Ω μm was maintained for more than a week. This PVD multilayer exonerates the use of chemical vapour deposition (CVD), glove-box chambers and sample manipulation between them, significantly reducing the fabrication cost, since battery and its encapsulation are fabricated in the same PVD chamber.

Hydroxyapatite formation on biomedical Ti–Ta–Zr alloys by magnetron sputtering and electrochemical deposition

Energy Technology Data Exchange (ETDEWEB)

Kim, Hyun-Ju [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Jeong, Yong-Hoon [Biomechanics and Tissue Engineering Laboratory, Division of Orthodontics, College of Dentistry, The Ohio State University, Columbus, OH (United States); Choe, Han-Cheol, E-mail: hcchoe@chosun.ac.kr [Department of Dental Materials, Research Center of Nano-Interface Activation for Biomaterials, and Research Center for Oral Disease Regulation of the Aged, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Brantley, William A. [Division of Prosthodontics and Restorative Science, College of Dentistry, The Ohio State University, Columbus, OH (United States)

2014-12-01

The purpose of this study was to investigate hydroxyapatite formation on Ti-25Ta-xZr titanium alloys resulting from radio-frequency magnetron sputtering and electrochemical deposition. Electrochemical deposition of hydroxyapatite (HA) was first carried out using a cyclic voltammetry (CV) method at 80 °C in 5 mM Ca (NO{sub 3}){sub 2} + 3 mM NH{sub 4}H{sub 2}PO{sub 4}. Then a physical vapor deposition (PVD) coating was obtained by a radio-frequency (RF) magnetron sputtering technique. The microstructures, phase transformations, and morphologies of the hydroxyapatite films deposited on the titanium alloys were analyzed by optical microscopy (OM), X-ray diffractometer (XRD), energy dispersive X-ray spectroscopy (EDS) and field-emission scanning electron microscopy (FE-SEM). The morphologies of electrochemically deposited HA showed plate-like shapes on the titanium alloys, and the morphologies of the RF-sputtered HA coating had the appearance droplet particles on the plate-like precipitates that had formed by electrochemical deposition. For the RF-sputtered HA coatings, the Ca/P ratio was increased, compared to that for the electrochemically deposited HA surface. Moreover, the RF-sputtered HA coating, consisting of agglomerated droplet particles on the electrochemically deposited HA surface, had better wettability compared to the bulk titanium alloy surface. - Highlights: • Hydroxyapatite (HA) was deposited on Ti–Ta–Zr alloys by radio-frequency (RF) magnetron sputtering and a cyclic voltammetry. • The morphologies of the RF-sputtered HA coating on electrochemical deposits presented plate-like shapes with a droplet particle. • The Ca/P ratio for RF-sputtered HA coatings was greater than that for electrochemical deposited HA coatings. • The RF-sputtered and electrochemical HA coatings had superior wettability compared to the electrochemically deposited coatings.

Hydroxyapatite formation on biomedical Ti–Ta–Zr alloys by magnetron sputtering and electrochemical deposition

International Nuclear Information System (INIS)

Kim, Hyun-Ju; Jeong, Yong-Hoon; Choe, Han-Cheol; Brantley, William A.

2014-01-01

The purpose of this study was to investigate hydroxyapatite formation on Ti-25Ta-xZr titanium alloys resulting from radio-frequency magnetron sputtering and electrochemical deposition. Electrochemical deposition of hydroxyapatite (HA) was first carried out using a cyclic voltammetry (CV) method at 80 °C in 5 mM Ca (NO 3 ) 2 + 3 mM NH 4 H 2 PO 4 . Then a physical vapor deposition (PVD) coating was obtained by a radio-frequency (RF) magnetron sputtering technique. The microstructures, phase transformations, and morphologies of the hydroxyapatite films deposited on the titanium alloys were analyzed by optical microscopy (OM), X-ray diffractometer (XRD), energy dispersive X-ray spectroscopy (EDS) and field-emission scanning electron microscopy (FE-SEM). The morphologies of electrochemically deposited HA showed plate-like shapes on the titanium alloys, and the morphologies of the RF-sputtered HA coating had the appearance droplet particles on the plate-like precipitates that had formed by electrochemical deposition. For the RF-sputtered HA coatings, the Ca/P ratio was increased, compared to that for the electrochemically deposited HA surface. Moreover, the RF-sputtered HA coating, consisting of agglomerated droplet particles on the electrochemically deposited HA surface, had better wettability compared to the bulk titanium alloy surface. - Highlights: • Hydroxyapatite (HA) was deposited on Ti–Ta–Zr alloys by radio-frequency (RF) magnetron sputtering and a cyclic voltammetry. • The morphologies of the RF-sputtered HA coating on electrochemical deposits presented plate-like shapes with a droplet particle. • The Ca/P ratio for RF-sputtered HA coatings was greater than that for electrochemical deposited HA coatings. • The RF-sputtered and electrochemical HA coatings had superior wettability compared to the electrochemically deposited coatings

Prevalence of early and late stages of physiologic PVD in emmetropic elderly population.

Science.gov (United States)

Schwab, Christoph; Ivastinovic, Domagoj; Borkenstein, Andreas; Lackner, Eva-Maria; Wedrich, Andreas; Velikay-Parel, Michaela

2012-05-01

To investigate the early and late stages of posterior vitreous detachment (PVD) in the foveal area in correlation with age and gender. Three hundred and thirty-five emmetropic eyes of 271 Caucasian patients (216 women/119 men) were examined by optical coherence tomography (OCT) and ultrasound (US). Eyes were classified into groups according to the patients age (up to 69.9; 70-74.9; 75-79.9; over 80 years) and to the clinical findings [Vitreous state: Detached in US; Detached in OCT; Foveal adhesion (FA); Attached vitreous]. The mean age was 76 ± 8 ranging from 44 to 89 years in female and 72 ± 10 ranging from 46 to 87 years in male subjects. The vitreous was attached in 32% of all eyes, 18.5% had FA, 18.5% were detached in OCT and 68% were detached in US. While prevalence of FA decreases with increasing age, OCT-diagnosed detachments did not change significantly with age. Between the ages of 70 and 75, an increase in PVD rates occurred. The prevalence of PVD was similar in both genders. Women were significantly older than men in the late-stage PVD in the eyes. The use of OCT and US enabled us to detect a partial or total PVD in 80% of the eyes. A sudden increase in late-stage PVD between the ages of 70 and 75 was observed, correlating with the reported age prevalence of various macular diseases. In contrast to myopics, both genders of elderly emmetropics have a similar prevalence of PVD. © 2011 The Authors. Acta Ophthalmologica © 2011 Acta Ophthalmologica Scandinavica Foundation.

7YSZ coating prepared by PS-PVD based on heterogeneous nucleation

Directory of Open Access Journals (Sweden)

Ziqian DENG

2018-04-01

Full Text Available Plasma spray-physical vapor deposition (PS-PVD as a novel coating process based on low-pressure plasma spray (LPPS has been significantly used for thermal barrier coatings (TBCs. A coating can be deposited from liquid splats, nano-sized clusters, and the vapor phase forming different structured coatings, which shows obvious advantages in contrast to conventional technologies like atmospheric plasma spray (APS and electron beam-physical vapor deposition (EB-PVD. In addition, it can be used to produce thin, dense, and porous ceramic coatings for special applications because of its special characteristics, such as high power, very low pressure, etc. These provide new opportunities to obtain different advanced microstructures, thus to meet the growing requirements of modern functional coatings. In this work, focusing on exploiting the potential of gas-phase deposition from PS-PVD, a series of 7YSZ coating experiments with various process conditions was performed in order to better understand the deposition process in PS-PVD, where coatings were deposited on different substrates including graphite and zirconia. Meanwhile, various substrate temperatures were investigated for the same substrate. As a result, a deposition mechanism of heterogeneous nucleation has been presented showing that surface energy is an important influencing factor for coating structures. Besides, undercooling of the interface between substrate and vapor phase plays an important role in coating structures. Keywords: 7YSZ, Deposition mechanism, Heterogeneous nucleation, PS-PVD, TBC

CrN/AlN nanolaminate coatings deposited via high power pulsed and middle frequency pulsed magnetron sputtering

International Nuclear Information System (INIS)

Bagcivan, N.; Bobzin, K.; Ludwig, A.; Grochla, D.; Brugnara, R.H.

2014-01-01

Nanolaminate coatings based on transition metal nitrides such as CrN, AlN and TiN deposited via physical vapor deposition (PVD) have shown great advantage as protective coatings on tools and components subject to high loads in tribological applications. By varying the individual layer materials and their thicknesses it is possible to optimize the coating properties, e.g. hardness, Young's modulus and thermal stability. One way for further improvement of coating properties is the use of advanced PVD technologies. High power pulsed magnetron sputtering (HPPMS) is an advancement of pulsed magnetron sputtering (MS). The use of HPPMS allows a better control of the energetic bombardment of the substrate due to the higher ionization degree of metallic species. It provides an opportunity to influence chemical and mechanical properties by varying the process parameters. The present work deals with the development of CrN/AlN nanolaminate coatings in an industrial scale unit by using two different PVD technologies. Therefore, HPPMS and mfMS (middle frequency magnetron sputtering) technologies were used. The bilayer period Λ, i.e. the thickness of a CrN/AlN double layer, was varied between 6.2 nm and 47.8 nm by varying the rotational speed of the substrate holders. In a second step the highest rotational speed was chosen and further HPPMS CrN/AlN coatings were deposited applying different HPPMS pulse lengths (40, 80, 200 μs) at the same mean cathode power and frequency. Thickness, morphology, roughness and phase composition of the coatings were analyzed by means of scanning electron microscopy (SEM), confocal laser microscopy, and X-ray diffraction (XRD), respectively. The chemical composition was determined using glow discharge optical emission spectroscopy (GDOES). Detailed characterization of the nanolaminate was conducted by transmission electron microscopy (TEM). The hardness and the Young's modulus were analyzed by nanoindentation measurements. The residual

Study of static properties of magnetron-type space charges; Etude des proprietes statiques des charges d'espace du type magnetron

Energy Technology Data Exchange (ETDEWEB)

Delcroix, Jean-Loup

1953-05-30

This research thesis reports an in-depth analysis of physical properties of static regimes to address the issue of space charges. This theoretical study of the Hull magnetron is followed by the description of experiments on the Hull magnetron which highlight transitions between the different regimes. Then, another theoretical approach aims at generalising the magnetron theory, based on other types of magnetron theory (general equations of magnetron-type space charges, inverted Hull magnetron theory, circular field magnetron theory)

Thermal conductivity issues of EB-PVD thermal barrier coatings

Energy Technology Data Exchange (ETDEWEB)

Schulz, U.; Raetzer-Scheibe, H.J.; Saruhan, B. [DLR - German Aerospace Center, Institute of Materials Research, 51170 Cologne (Germany); Renteria, A.F. [BTU, Physical Metallurgy and Materials Technology, Cottbus (Germany)

2007-09-15

The thermal conductivity of electron-beam physical vapor deposited (EB-PVD) thermal barrier coatings (TBCs) was investigated by the Laser Flash technique. Sample type and methodology of data analyses as well as atmosphere during the measurement have some influence on the data. A large variation of the thermal conductivity was found by changes in TBC microstructure. Exposure at high temperature caused sintering of the porous microstructure that finally increased thermal conductivity up to 30 %. EB-PVD TBCs show a distinct thickness dependence of the thermal conductivity due to the anisotropic microstructure in thickness direction. Thin TBCs had a 20 % lower thermal conductivity than thick coatings. New compositions of the ceramic top layer offer the largest potential to lower thermal conductivity. Values down to 0.8W/(mK) have been already demonstrated with virgin coatings of pyrochlore compositions. (Abstract Copyright [2007], Wiley Periodicals, Inc.) [German] Die Waermeleitfaehigkeit von elektronenstrahl-aufgedampften (EB-PVD) Waermedaemmschichten (TBCs) wurde mittels Laser-Flash untersucht. Probentyp, Messmethodik und die Atmosphaere waehrend der Messung haben einen Einfluss auf die Ergebnisse. Aenderungen in der Mikrostruktur der TBC fuehrten zu grossen Unterschieden der Waermeleitfaehigkeit. Eine Hochtemperaturbelastung verursachte Sintervorgaenge in der poroesen Mikrostruktur, was die Waermeleitfaehigkeit um bis zu 30 % ansteigen liess. EB-PVD TBCs zeigen eine deutliche Dickenabhaengigkeit der Waermeleitfaehigkeit durch die Anisotropie der Mikrostruktur in dieser Richtung. Duenne TBCs haben eine um 20 % geringere Waermeleitfaehigkeit als dicke Schichten. Neue Zusammensetzungen der keramischen Deckschicht bieten die groessten Moeglichkeiten fuer eine Reduktion der Waermeleitfaehigkeit. Werte bis zu 0,8 W/(mK) wurden damit bereits erreicht. (Abstract Copyright [2007], Wiley Periodicals, Inc.)

A novel monolithic LEU foil target based on a PVD manufacturing process for 99Mo production via fission.

Science.gov (United States)

Hollmer, Tobias; Petry, Winfried

2016-12-01

99 Mo is the most widely used radioactive isotope in nuclear medicine. Its main production route is the fission of uranium. A major challenge for a reliable supply is the conversion from highly enriched uranium (HEU) to low enriched uranium (LEU). A promising candidate to realize this conversion is the cylindrical LEU irradiation target. The target consists of a uranium foil encapsulated between two coaxial aluminum cladding cylinders. This target allows a separate processing of the irradiated uranium foil and the cladding when recovering the 99 Mo. Thereby, both the costs and the volume of highly radioactive liquid waste are significantly reduced compared to conventional targets. The presented manufacturing process is based on the direct coating of the uranium on the inside of the outer cladding cylinder. This process was realized by a cylindrical magnetron enhanced physical vapor deposition (PVD) technique. The method features a highly automated process, a good quality of the resulting uranium foils and a high material utilization. Copyright © 2016 Elsevier Ltd. All rights reserved.

Plasma and process characterization of high power magnetron physical vapor deposition with integrated plasma equipment--feature profile model

International Nuclear Information System (INIS)

Zhang Da; Stout, Phillip J.; Ventzek, Peter L.G.

2003-01-01

High power magnetron physical vapor deposition (HPM-PVD) has recently emerged for metal deposition into deep submicron features in state of the art integrated circuit fabrication. However, the plasma characteristics and process mechanism are not well known. An integrated plasma equipment-feature profile modeling infrastructure has therefore been developed for HPM-PVD deposition, and it has been applied to simulating copper seed deposition with an Ar background gas for damascene metalization. The equipment scale model is based on the hybrid plasma equipment model [M. Grapperhaus et al., J. Appl. Phys. 83, 35 (1998); J. Lu and M. J. Kushner, ibid., 89, 878 (2001)], which couples a three-dimensional Monte Carlo sputtering module within a two-dimensional fluid model. The plasma kinetics of thermalized, athermal, and ionized metals and the contributions of these species in feature deposition are resolved. A Monte Carlo technique is used to derive the angular distribution of athermal metals. Simulations show that in typical HPM-PVD processing, Ar + is the dominant ionized species driving sputtering. Athermal metal neutrals are the dominant deposition precursors due to the operation at high target power and low pressure. The angular distribution of athermals is off axis and more focused than thermal neutrals. The athermal characteristics favor sufficient and uniform deposition on the sidewall of the feature, which is the critical area in small feature filling. In addition, athermals lead to a thick bottom coverage. An appreciable fraction (∼10%) of the metals incident to the wafer are ionized. The ionized metals also contribute to bottom deposition in the absence of sputtering. We have studied the impact of process and equipment parameters on HPM-PVD. Simulations show that target power impacts both plasma ionization and target sputtering. The Ar + ion density increases nearly linearly with target power, different from the behavior of typical ionized PVD processing. The

Simultaneous Co-deposition of Zn-Mg Alloy Layers on Steel Strip by PVD Process

Energy Technology Data Exchange (ETDEWEB)

Kim, Tae Yeob [POSCO Technical Research Laboratories, Gwangyang (Korea, Republic of); Goodenough, Mark [Strategic Marketing, Tata Steel, Warwickshire (United Kingdom)

2011-12-15

This is the first release of an interim report on the development of coating technology of Zn-Mg alloy layers on steel strip by EML-PVD (electromagnetic levitation - physical vapor deposition) process in an air-to-air type continuous PVD pilot plant. It intends to introduce a basic principle of the EML-PVD process together with the high speed PVD pilot plant built in Posco. Due to the agitation effect provided by the high frequency induction coil, simultaneous evaporation of Zn and Mg from a droplet could produce alloy coating layers with Mg content of 6% to 12% depending on the composition of the droplet inside the coil. For its superior corrosion resistance, Zn-Mg alloy coated steel would be a very promising material for automotive, electrical appliances, and construction applications.

Simultaneous Co-deposition of Zn-Mg Alloy Layers on Steel Strip by PVD Process

International Nuclear Information System (INIS)

Kim, Tae Yeob; Goodenough, Mark

2011-01-01

This is the first release of an interim report on the development of coating technology of Zn-Mg alloy layers on steel strip by EML-PVD (electromagnetic levitation - physical vapor deposition) process in an air-to-air type continuous PVD pilot plant. It intends to introduce a basic principle of the EML-PVD process together with the high speed PVD pilot plant built in Posco. Due to the agitation effect provided by the high frequency induction coil, simultaneous evaporation of Zn and Mg from a droplet could produce alloy coating layers with Mg content of 6% to 12% depending on the composition of the droplet inside the coil. For its superior corrosion resistance, Zn-Mg alloy coated steel would be a very promising material for automotive, electrical appliances, and construction applications

Adaptive PVD Steganography Using Horizontal, Vertical, and Diagonal Edges in Six-Pixel Blocks

Directory of Open Access Journals (Sweden)

Anita Pradhan

2017-01-01

Full Text Available The traditional pixel value differencing (PVD steganographical schemes are easily detected by pixel difference histogram (PDH analysis. This problem could be addressed by adding two tricks: (i utilizing horizontal, vertical, and diagonal edges and (ii using adaptive quantization ranges. This paper presents an adaptive PVD technique using 6-pixel blocks. There are two variants. The proposed adaptive PVD for 2×3-pixel blocks is known as variant 1, and the proposed adaptive PVD for 3×2-pixel blocks is known as variant 2. For every block in variant 1, the four corner pixels are used to hide data bits using the middle column pixels for detecting the horizontal and diagonal edges. Similarly, for every block in variant 2, the four corner pixels are used to hide data bits using the middle row pixels for detecting the vertical and diagonal edges. The quantization ranges are adaptive and are calculated using the correlation of the two middle column/row pixels with the four corner pixels. The technique performs better as compared to the existing adaptive PVD techniques by possessing higher hiding capacity and lesser distortion. Furthermore, it has been proven that the PDH steganalysis and RS steganalysis cannot detect this proposed technique.

RHEED oscillations in spinel ferrite epitaxial films grown by conventional planar magnetron sputtering

Science.gov (United States)

Ojima, T.; Tainosho, T.; Sharmin, S.; Yanagihara, H.

2018-04-01

Real-time in situ reflection high energy electron diffraction (RHEED) observations of Fe3O4, γ-Fe2O3, and (Co,Fe)3O4 films on MgO(001) substrates grown by a conventional planar magnetron sputtering was studied. The change in periodical intensity of the specular reflection spot in the RHEED images of three different spinel ferrite compounds grown by two different sputtering systems was examined. The oscillation period was found to correspond to the 1/4 unit cell of each spinel ferrite, similar to that observed in molecular beam epitaxy (MBE) and pulsed laser deposition (PLD) experiments. This suggests that the layer-by-layer growth of spinel ferrite (001) films is general in most physical vapor deposition (PVD) processes. The surfaces of the films were as flat as the surface of the substrate, consistent with the observed layer-by-layer growth process. The observed RHEED oscillation indicates that even a conventional sputtering method can be used to control film thickness during atomic layer depositions.

RHEED oscillations in spinel ferrite epitaxial films grown by conventional planar magnetron sputtering

Directory of Open Access Journals (Sweden)

T. Ojima

2018-04-01

Full Text Available Real-time in situ reflection high energy electron diffraction (RHEED observations of Fe3O4, γ-Fe2O3, and (Co,Fe3O4 films on MgO(001 substrates grown by a conventional planar magnetron sputtering was studied. The change in periodical intensity of the specular reflection spot in the RHEED images of three different spinel ferrite compounds grown by two different sputtering systems was examined. The oscillation period was found to correspond to the 1/4 unit cell of each spinel ferrite, similar to that observed in molecular beam epitaxy (MBE and pulsed laser deposition (PLD experiments. This suggests that the layer-by-layer growth of spinel ferrite (001 films is general in most physical vapor deposition (PVD processes. The surfaces of the films were as flat as the surface of the substrate, consistent with the observed layer-by-layer growth process. The observed RHEED oscillation indicates that even a conventional sputtering method can be used to control film thickness during atomic layer depositions.

PVD Ti coatings on Sm-Co magnets

International Nuclear Information System (INIS)

Bovda, O.M.; Bovda, V.O.; Garkusha, I.E.; Leonov, S.O.; Onishchenko, L.V.; Tereshin, V.I.; Totrika, O.S.; Chen, C.H.

2008-01-01

The combination of conventional ion-plasma deposition (PVD) and pulsed plasma technologies (PPT) has been applied for rare-earth Sm-Co based magnets, to provide them with enhanced corrosion resistance. The influence of pulsed plasma treatment on Sm-Co magnets with deposited titanium PVD coatings has been investigated. It was revealed that thickness of modified layer significantly depends on the thickness of initial titanium film and plasma treatment regimes. As a result of plasma treatment with energy density of 30 J/cm 2 and pulse duration of ∼ 5 μs fine-grained layer with the thickness of 70 microns has been formed on the Sm-Co magnet with pure titanium film of 50 micron. According to SEM analyses considerable diffusion of titanium to the bulk of the magnet, on the depth of 20 microns, took place. Such reaction enhances strong bonding between the coating and the magnet

Geometric considerations in magnetron sputtering

International Nuclear Information System (INIS)

Thornton, J.A.

1982-01-01

The recent development of high performance magnetron type discharge sources has greatly enhaced the range of coating applications where sputtering is a viable deposition process. Magnetron sources can provide high current densities and sputtering rates, even at low pressures. They have much reduced substrate heating rates and can be scaled to large sizes. Magnetron sputter coating apparatuses can have a variety of geometric and plasma configurations. The target geometry affects the emission directions of both the sputtered atoms and the energetic ions which are neutralized and reflected at the cathode. This fact, coupled with the long mean free particle paths which are prevalent at low pressures, can make the coating properties very dependent on the apparatus geometry. This paper reviews the physics of magnetron operation and discusses the influences of apparatus geometry on the use of magnetrons for rf sputtering and reactive sputtering, as well as on the microstructure and internal stresses in sputtered metallic coatings. (author) [pt

The Pulsed Cylindrical Magnetron for Deposition

Science.gov (United States)

Korenev, Sergey

2012-10-01

The magnetron sputtering deposition of films and coatings broadly uses in microelectronics, material science, environmental applications and etc. The rate of target evaporation and time for deposition of films and coatings depends on magnetic field. These parameters link with efficiency of gas molecules ionization by electrons. The cylindrical magnetrons use for deposition of films and coatings on inside of pipes for different protective films and coatings in oil, chemical, environmental applications. The classical forming of magnetic field by permanent magnets or coils for big and long cylindrical magnetrons is complicated. The new concept of pulsed cylindrical magnetron for high rate deposition of films and coating for big and long pipes is presented in this paper. The proposed cylindrical magnetron has azimuthally pulsed high magnetic field, which allows forming the high ionized plasma and receiving high rate of evaporation material of target (central electrode). The structure of proposed pulsed cylindrical magnetron sputtering system is given. The main requirements to deposition system are presented. The preliminary data for forming of plasma and deposition of Ta films and coatings on the metal pipers are discussed. The comparison of classical and proposed cylindrical magnetrons is given. The analysis of potential applications is considered.

Effect of Annealing Temperature on the Water Contact Angle of PVD Hard Coatings.

Science.gov (United States)

Yang, Yu-Sen; Cho, Ting-Pin

2013-08-07

Various PVD (physical vapor deposition) hard coatings including nitrides and metal-doped diamond-like carbons (Me-DLC) were applied in plastic injection and die-casting molds to improve wear resistance and reduce sticking. In this study, nitrides hcp-AlN (hexagonal close-packed AlN), Cr₂N, (CrAl)₂N) and Me-DLC (Si-DLC and Cr-DLC) coatings were prepared using a closed field unbalanced magnetron reactive sputtering system. The coatings were annealed in air for 2 h at various temperatures, after which the anti-sticking properties were assessed using water contact angle (WCA) measurements. The as-deposited hcp-AlN, Cr₂N and (CrAl)₂N coatings exhibit hydrophobic behavior and exhibit respective WCAs of 119°, 106° and 101°. The as-deposited Si-DLC and Cr-DLC coatings exhibit hydrophilic behavior and exhibit respective WCAs of 74° and 88°. The annealed Cr₂N and (CrAl)₂N coatings exhibit hydrophobic behavior with higher WCAs, while the annealed hcp-AlN, Si-DLC and Cr-DLC coatings are hydrophilic. The increased WCA of the annealed Cr₂N and (CrAl)₂N coatings is related to their crystal structure and increased roughness. The decreased WCA of the annealed hcp-AlN, Si-DLC and Cr-DLC coatings is related to their crystal structures and has little correlation with roughness.

Development of environmentally compatible tribosystems with PVD-technology

International Nuclear Information System (INIS)

Lugscheider, E.; Hornig, T.; Kienitz, S.; Klocke, F.; Krieg, T.

2001-01-01

PVD coatings offer a wide variety of applications. The focal point of this work is the development of an advanced type of PVD-hardcoating which allows machining with environmentally compatible lubricants. Representative examples for the investigations are the tribological systems 'turning of quenched and tempered steel 42CrMo4 V' and 'austenitic stainless steel X5CrNi18-10'. Ti-Hf-Cr-N and TiAlN/Al 2 O 3 were deposited by AIP- and H.I.S. TM - process respectively. These coating systems showed best results concerning oxidation wear and abrasive wear in former investigations. This was necessary because main cutting-edge life criterias are oxidation wear and abrasive wear at the minor cutting edge. Consequently, a high oxidation stability and a high hardness at high temperatures are required. (author)

EB-PVD process management for highly productive zirconia thermal barrier coating of turbine blades

International Nuclear Information System (INIS)

Reinhold, E.; Botzler, P.; Deus, C.

1999-01-01

Zirconia thermal barrier coatings are well used in the turbine manufacturing industry because they ensure extended lifetimes of turbine blades. Compared with other techniques, EB-PVD processes are best suited for the deposition on turbine blades with regard to the layer properties. Therefore EB-PVD coaters for turbine blades are becoming increasingly interesting. The coating costs per component are mainly dependent on a highly productive solution for the deposition task. Thus the EB-PVD process management has to be optimized in order to meet the productivity requirements of the manufacturers. This includes the requirement of high deposition rates, large deposition areas, long time stable production cycles as well as a matched duration of preheating, deposition and cooling down per charge. Modern EB-PVD solutions to be introduced allow deposition rates on blades up to 7 μm/min. The consequences for the technological process management and plant design concerning long time stable coating cycles with high productivity will be discussed. (orig.)

Study of static properties of magnetron-type space charges

International Nuclear Information System (INIS)

Delcroix, Jean-Loup

1953-01-01

This research thesis reports an in-depth analysis of physical properties of static regimes to address the issue of space charges. This theoretical study of the Hull magnetron is followed by the description of experiments on the Hull magnetron which highlight transitions between the different regimes. Then, another theoretical approach aims at generalising the magnetron theory, based on other types of magnetron theory (general equations of magnetron-type space charges, inverted Hull magnetron theory, circular field magnetron theory)

Pain, psychological distress and motor pattern in women with provoked vestibulodynia (PVD) - symptom characteristics and therapy suggestions.

Science.gov (United States)

Haugstad, Gro Killi; Wojniusz, Slawomir; Kirste, Unni Merete; Kirschner, Rolf Steinar; Lilleheie, Ingvild; Haugstad, Tor Sigbjørn

2018-04-25

Provoked vestibulodynia (PVD) represent a longstanding pain syndrome that affects large numbers of women worldwide. However, no standardized guidelines for PVD treatment exist. In a cross-sectional pilot study we examined 30 PVD patients on multidimensional parameters including pain, psychological distress and quality of movement, in order to obtain a broader understanding of the somatic and psychological symptoms in PVD, and for the future to develop better interventions. Additionally, we compare the findings to previously published results regarding the same parameters in women with chronic pelvic pain (CPP). Thirty women with PVD recruited from a tertiary care university clinic of gynecology were assessed for demographic data, pain intensity (VAS), psychological distress (GHQ-30 and Tampa scale of Kinesophobia) and quality of movement (standardized Mensendieck test, SMT). Average age of the PVD women was 24.7±3.60 years, 60% of them were in permanent relationships, all were nulliparous, none had been subjected to surgical procedures, 100% were working full or part time and 90% were educated to at least undergraduate level. Mean VAS score was 7.77±1.97 (mean±SD), kinesiophobia 24.4±3.95 and anxiety domain of GHQ-30 9.73±4.06. SMT scores were particularly low for the domains of respiration and gait (less than 50% of optimal scores). PVD women display reduced quality of movement, especially for gait and respiration patterns, increased level of anxiety and high average pain scores. These findings are similar to what we have previously reported in CPP patients. However, in contrast to CPP group, PVD women are on average younger, have higher work participation, higher education level and have not been subjected to surgical procedures. Since PVD women display similar, although somewhat less severe, symptom profile than CPP, we suggest that a multidimensional approach to treatment, such as "somatocognitive therapy" should be investigated in this group as it has

Adhesion and interface problems of EB-PVD thermal barrier coatings; Grenzschichtproblematik und Haftung von EB-PVD-Waermedaemmschichtsystemen

Energy Technology Data Exchange (ETDEWEB)

Fritscher, K.; Leyens, C. [Deutsche Forschungsanstalt fuer Luft- und Raumfahrt e.V. (DLR), Koeln (Germany). Inst. fuer Werkstoff-Forschung

1996-12-31

Loss of adhesion in thermal insulation layers produced by EB-PVD may be caused by surface morphologies or oxide phases resulting from previous process stages, e.g. shot peening, or inappropriate annealing conditions. These undesirable oxide phases are mostly spinels and silicates which pose mechanical problems. Annealing and densification must be modified in order to promote the formation of {alpha}-Al{sub 2}O{sub 3} layers. It may also be possible to avoid certain categories of flaws by changing one material partner (e.g. by using {beta}-NiAl-free adhesive layers). [Deutsch] Die Ursachen der Einbussen der Haftung in WDS-Systemen aus EB-PVD-Fertigung liegen oft in der Ausbildung von Oberflaechenmorphologien oder von Oxidphasen begruendet, die aus den der WDS-Beschichtung vorangehenden Verfahrensschritten wie z.B. des Glasperlstrahlens und von unangemessenen Gluehbedingungen herruehren koennen. Bei diesen unerwuenschten Oxidphasen handelt es sich u.a. um Spinelle und Silikate, die in mechanischer Hinsicht problematisch sind. Glueh- und Verdichtungsroutinen sind entsprechend zu modifizieren, um die Bildung von {alpha}-Al{sub 2}O{sub 3}-Schichten zu foerdern. Moeglicherweise sind gewisse Fehlerkategorien bereits dadurch zu umgehen, dass ein Materialpartner geaendert wird (Beispiel: {beta}-NiAl-freie Haftschichten anwenden). (orig.)

Latest Developments in PVD Coatings for Tooling

Directory of Open Access Journals (Sweden)

Gabriela Strnad

2010-06-01

Full Text Available The paper presents the recent developments in the field of PVD coating for manufacturing tools. A review of monoblock, multilayer, nanocomposite, DLC and oxinitride coatings is discussed, with the emphasis on coatings which enables the manufacturers to implement high productivity processes such as high speed cutting and dry speed machining.

Clinical use of Malay Version of Vertigo Symptom Scale (MWSS) in patients with peripheral vestibular disorder (PVD).

Science.gov (United States)

Zainun, Zuraida; Zakaria, Mohd Normani; Sidek, Dinsuhaimi; Ismail, Zalina

2012-08-01

The Vertigo symptom scale (VSS) is a well established tool for the evaluation of vestibular disorders and the associated symptoms of autonomic arousal and somatosensation. By using a validated Malay version of vertigo symptom scale (MVVSS) questionnaire, the severity of the vertigo from patients' perspective can be determined and rated. Before MVVSS can be applied clinically among Malaysians, it was of interest to determine its clinical value in identifying vestibular disorders. Forty normal and 65 PVD subjects participated in this cross-sectional study. Normal subjects were recruited amongst Universiti Sains Malaysia (USM) staff and students who had no history of ear and vestibular disorders. Mean total score of MVVSS in normal and PVD subjects were 13.9 +/- 11.1 and 30.1 +/- 20.9, respectively. When the total scores of normal and PVD group were compared, the Mann-Whitney U test showed that there was a significant difference between the two groups (p PVD [benign paroxymal positional vertigo (BPPV), Meniere's disease, labyrinthitis and unknown] have different MVVSS results. However, analysis of variance (ANOVA) found no significant difference in term of outcomes of MVVSS among the different PVD pathologies. Using receiver operating characteristic curve (ROC) method, the sensitivity and specificity of MVVSS were 71% and 60%, respectively. MVVSS is able to discriminate clinically among the normal and PVD subjects. However, it is not a good indicator for differential diagnosis of PVD subtypes, at least in this study. Its sensitivity and specificity in clinical diagnosis are reasonably high. Perhaps a bigger sample size would be useful to further study the clinical usefulness of MVVSS.

Magnetron plasma and nanotechnology

International Nuclear Information System (INIS)

Kashtanov, Pavel V; Smirnov, Boris M; Hippler, Rainer

2007-01-01

Magnetron plasma processes involving metal atoms and clusters are reviewed. The formation of metal atoms near the cathode and their nucleation in a buffer gas flow are discussed. The flow of a buffer gas with metal clusters through a magnetron chamber disturbs the equilibrium between the buffer gas flow and clusters near the exit orifice and is accompanied by cluster attachment to the chamber walls. Cluster charging far off the cathode, the disturbance of equilibrium between the buffer gas flow and cluster drift, and the attachment of charged clusters to the chamber walls - the factors determining the output parameters of the cluster beam escaping the magnetron chamber - are analyzed. Cluster deposition on a solid surface and on dusty plasma particles is considered. (reviews of topical problems)

Frozen-in vacancies in PVD-Cu films with improved high-pressure reflowability studied using a slow positron beam

Energy Technology Data Exchange (ETDEWEB)

Yabuuchi, A; Kubo, D; Mizuno, M; Araki, H [Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871 (Japan); Onishi, T [Materials Research Laboratory, Kobe Steel Ltd., 5-5 Takatsukadai 1-chome, Nishi-ku, Kobe, Hyogo 651-2271 (Japan); Shirai, Y [Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501 (Japan)], E-mail: atsushi.yabuuchi@mat.eng.osaka-u.ac.jp

2009-05-01

Recently, a new process has been proposed for fabricating a LSI interconnection; filling trenches and via holes with Cu using high-pressure annealing treatment. It is already known that a Cu film produced by physical vapor deposition (PVD) has a lower reflowability compared to a Cu film produced by electrochemical deposition (ECD). Additionally, it has also been recognized that the addition of Sb to the PVD-Cu film improves the reflowability. However, the factors responsible for the reflowability of Cu films have not yet been studied. In this work, we evaluated a PVD pure-Cu film and a PVD Cu-0.5at%Sb film by using a slow positron beam. Addition of Sb led to the introduction of lattice defects in the as-deposited film. These defects that were observed in the PVD-CuSb dilute alloy film were identified as frozen-in vacancies that were produced during deposition.

Frozen-in vacancies in PVD-Cu films with improved high-pressure reflowability studied using a slow positron beam

International Nuclear Information System (INIS)

Yabuuchi, A; Kubo, D; Mizuno, M; Araki, H; Onishi, T; Shirai, Y

2009-01-01

Recently, a new process has been proposed for fabricating a LSI interconnection; filling trenches and via holes with Cu using high-pressure annealing treatment. It is already known that a Cu film produced by physical vapor deposition (PVD) has a lower reflowability compared to a Cu film produced by electrochemical deposition (ECD). Additionally, it has also been recognized that the addition of Sb to the PVD-Cu film improves the reflowability. However, the factors responsible for the reflowability of Cu films have not yet been studied. In this work, we evaluated a PVD pure-Cu film and a PVD Cu-0.5at%Sb film by using a slow positron beam. Addition of Sb led to the introduction of lattice defects in the as-deposited film. These defects that were observed in the PVD-CuSb dilute alloy film were identified as frozen-in vacancies that were produced during deposition.

Effect of Annealing Temperature on the Water Contact Angle of PVD Hard Coatings

Science.gov (United States)

Yang, Yu-Sen; Cho, Ting-Pin

2013-01-01

Various PVD (physical vapor deposition) hard coatings including nitrides and metal-doped diamond-like carbons (Me-DLC) were applied in plastic injection and die-casting molds to improve wear resistance and reduce sticking. In this study, nitrides hcp-AlN (hexagonal close-packed AlN), Cr2N, (CrAl)2N) and Me-DLC (Si-DLC and Cr-DLC) coatings were prepared using a closed field unbalanced magnetron reactive sputtering system. The coatings were annealed in air for 2 h at various temperatures, after which the anti-sticking properties were assessed using water contact angle (WCA) measurements. The as-deposited hcp-AlN, Cr2N and (CrAl)2N coatings exhibit hydrophobic behavior and exhibit respective WCAs of 119°, 106° and 101°. The as-deposited Si-DLC and Cr-DLC coatings exhibit hydrophilic behavior and exhibit respective WCAs of 74° and 88°. The annealed Cr2N and (CrAl)2N coatings exhibit hydrophobic behavior with higher WCAs, while the annealed hcp-AlN, Si-DLC and Cr-DLC coatings are hydrophilic. The increased WCA of the annealed Cr2N and (CrAl)2N coatings is related to their crystal structure and increased roughness. The decreased WCA of the annealed hcp-AlN, Si-DLC and Cr-DLC coatings is related to their crystal structures and has little correlation with roughness. PMID:28811440

Pulsed dc self-sustained magnetron sputtering

International Nuclear Information System (INIS)

Wiatrowski, A.; Posadowski, W. M.; Radzimski, Z. J.

2008-01-01

The magnetron sputtering has become one of the commonly used techniques for industrial deposition of thin films and coatings due to its simplicity and reliability. At standard magnetron sputtering conditions (argon pressure of ∼0.5 Pa) inert gas particles (necessary to sustain discharge) are often entrapped in the deposited films. Inert gas contamination can be eliminated during the self-sustained magnetron sputtering (SSS) process, where the presence of the inert gas is not a necessary requirement. Moreover the SSS process that is possible due to the high degree of ionization of the sputtered material also gives a unique condition during the transport of sputtered particles to the substrate. So far it has been shown that the self-sustained mode of magnetron operation can be obtained using dc powering (dc-SSS) only. The main disadvantage of the dc-SSS process is its instability related to random arc formation. In such case the discharge has to be temporarily extinguished to prevent damaging both the magnetron source and power supply. The authors postulate that pulsed powering could protect the SSS process against arcs, similarly to reactive pulsed magnetron deposition processes of insulating thin films. To put this concept into practice, (i) the high enough plasma density has to be achieved and (ii) the type of pulsed powering has to be chosen taking plasma dynamics into account. In this article results of pulsed dc self-sustained magnetron sputtering (pulsed dc-SSS) are presented. The planar magnetron equipped with a 50 mm diameter and 6 mm thick copper target was used during the experiments. The maximum target power was about 11 kW, which corresponded to the target power density of ∼560 W/cm 2 . The magnetron operation was investigated as a function of pulse frequency (20-100 kHz) and pulse duty factor (50%-90%). The discharge (argon) extinction pressure level was determined for these conditions. The plasma emission spectra (400-410 nm range) and deposition

Analysis of influence of different pressure and different depth of pvd on soft foundation treatment

Science.gov (United States)

Li, Bin; Wang, XueKui

2018-02-01

According to the depth of plastic vertical drainage (pvd), the arrangement mode and the loading mode to analyze the influence of Vacuum preloading near the existing road. An arrangement mode of vacuum preloading to reduce the impact was put forward. The combination of different depth of pvd and loading modes are used to analyze the effect of vacuum preloading treatment and its influence range. The calculations show that the deformation and the influence distance are smaller by using the 40kPa vacuum loading and 41kPa surcharge load preloading. Reducing the depth of the pvd and vacuum combined surcharge preloading can weaken the influence to the existing highway.

Morphology of PVD films

International Nuclear Information System (INIS)

Carr, M.J.; Grotzky, V.K.; Helms, C.J.; Johns, W.L.; Naimon, E.R.; Rafalski, A.L.; Smith, C.J.

1982-01-01

Experimental data show that the morphology of PVD chromium coatings is dependent on substrate temperature, deposition rate, and the oxygen content of the chromium source material. For chromium containing about 700-ppM oxygen, a variety of morphologies can form depending on substrate temperature and deposition rate. For chromium contaning 1000 to 2000 ppM of oxygen, porous coatings of the Type IV variety are produced over essentially the full range of temperatures and rates possible with current coating equipment. For chromium containing less than about 400 ppM of oxygen, dense coatings of the Type I variety are produced over the range of temperatures and rates investigated

Analysis of peer-to-peer locking of magnetrons

International Nuclear Information System (INIS)

Pengvanich, P.; Lau, Y. Y.; Cruz, E.; Gilgenbach, R. M.; Hoff, B.; Luginsland, J. W.

2008-01-01

The condition for mutual, or peer-to-peer, locking of two magnetrons is derived. This condition reduces to Adler's classical phase-locking condition in the limit where one magnetron becomes the ''master'' and the other becomes the ''slave.'' The formulation is extended to the peer-to-peer locking of N magnetrons, under the assumption that the electromagnetic coupling among the N magnetrons is modeled by an N-port network.

Stability of Brillouin flow in planar, conventional, and inverted magnetrons

International Nuclear Information System (INIS)

Simon, D. H.; Lau, Y. Y.; Greening, G.; Wong, P.; Gilgenbach, R. M.; Hoff, B. W.

2015-01-01

The Brillouin flow is the prevalent flow in crossed-field devices. We systematically study its stability in the conventional, planar, and inverted magnetron geometry. To investigate the intrinsic negative mass effect in Brillouin flow, we consider electrostatic modes in a nonrelativistic, smooth bore magnetron. We found that the Brillouin flow in the inverted magnetron is more unstable than that in a planar magnetron, which in turn is more unstable than that in the conventional magnetron. Thus, oscillations in the inverted magnetron may startup faster than the conventional magnetron. This result is consistent with simulations, and with the negative mass property in the inverted magnetron configuration. Inclusion of relativistic effects and electromagnetic effects does not qualitatively change these conclusions

Comparative study of dlc coatings by pvd against cvd technique on textile dents

International Nuclear Information System (INIS)

Malik, M.; Alam, S.; Iftikhar, F.

2007-01-01

Diamond like Carbon (DLC) film is a hard amorphous carbon hydride film formed by Physical or Chemical vapor deposition (PVD or CVD) techniques. Due to its unique properties especially high hardness, lower coefficient of friction and lubricious nature, these coatings are not only used to extend the life of cutting tools but also for non cutting applications such as for forming dies, molds and on many functional parts of textile. In the present work two techniques were employed i.e. PVD and CVD for deposition of diamond like carbon film on textile dents. These dents are used as thread guider in high speed weaving machine. The measurement of coating thickness, adhesion, hardness and roughness values indicates that overall properties of DLC coating developed by PVD LARC technology reduces abrasion and increases the workability and durability of textile dents as well as suppress the need of lubricants. (author)

Thermal Conductivity of EB-PVD Thermal Barrier Coatings Evaluated by a Steady-State Laser Heat Flux Technique

Science.gov (United States)

Zhu, Dongming; Miller, Robert A.; Nagaraj, Ben A.; Bruce, Robert W.

2000-01-01

The thermal conductivity of electron beam-physical vapor deposited (EB-PVD) Zr02-8wt%Y2O3 thermal barrier coatings was determined by a steady-state heat flux laser technique. Thermal conductivity change kinetics of the EB-PVD ceramic coatings were also obtained in real time, at high temperatures, under the laser high heat flux, long term test conditions. The thermal conductivity increase due to micro-pore sintering and the decrease due to coating micro-delaminations in the EB-PVD coatings were evaluated for grooved and non-grooved EB-PVD coating systems under isothermal and thermal cycling conditions. The coating failure modes under the high heat flux test conditions were also investigated. The test technique provides a viable means for obtaining coating thermal conductivity data for use in design, development, and life prediction for engine applications.

Identification of residues of FpvA involved in the different steps of Pvd-Fe uptake in Pseudomonas aeruginosa.

Science.gov (United States)

Nader, Mirella; Dobbelaere, Wim; Vincent, Michel; Journet, Laure; Adams, Hendrik; Cobessi, David; Gallay, Jacques; Schalk, Isabelle J

2007-10-23

FpvA is an outer membrane transporter involved in iron uptake by the siderophore pyoverdine (Pvd) in Pseudomonas aeruginosa. This transporter, like all other proteins of the same family, consists of a transmembrane 22 beta-stranded barrel occluded by a plug domain. The beta-strands of the barrel are connected by large extracellular loops and short periplasmic turns. Site-directed mutagenesis was carried out on FpvA to identify the extracellular loops or parts of these loops involved in the various stages of Pvd-Fe uptake. The G286C, W362C, and W434C mutations in loops L1, L3, and L4, respectively, disturbed the binding of the apo siderophore, as shown by time-resolved fluorescence spectroscopy. Iron uptake experiments followed by fluorescence resonance energy transfer (FRET) or using 55Fe indicated that residues W434 and G701 and, therefore, loops L4 and L9 must be involved in Pvd-Fe uptake by FpvA. The two corresponding mutants incorporated smaller than normal amounts of 55Fe into cells, and no Pvd recycling on FpvA was observed after iron release. Surprisingly, the S603C mutation in loop L7 increased the amount of Pvd-Fe transported. Our results suggest that W434 (L4), S603 (L7), and G701 (L9) are involved in the mechanism of Pvd-Fe uptake.

Negative Ion Sources: Magnetron and Penning

CERN Document Server

Faircloth, D.C.

2013-12-16

The history of the magnetron and Penning electrode geometry is briefly outlined. Plasma generation by electrical discharge-driven electron impact ionization is described and the basic physics of plasma and electrodes relevant to magnetron and Penning discharges are explained. Negative ions and their applications are introduced, along with their production mechanisms. Caesium and surface production of negative ions are detailed. Technical details of how to build magnetron and Penning surface plasma sources are given, along with examples of specific sources from around the world. Failure modes are listed and lifetimes compared.

Negative Ion Sources: Magnetron and Penning

International Nuclear Information System (INIS)

Faircloth, D C

2013-01-01

The history of the magnetron and Penning electrode geometry is briefly outlined. Plasma generation by electrical discharge-driven electron impact ionization is described and the basic physics of plasma and electrodes relevant to magnetron and Penning discharges are explained. Negative ions and their applications are introduced, along with their production mechanisms. Caesium and surface production of negative ions are detailed. Technical details of how to build magnetron and Penning surface plasma sources are given, along with examples of specific sources from around the world. Failure modes are listed and lifetimes compared. (author)

Electrospun PVdF-based fibrous polymer electrolytes for lithium ion polymer batteries

International Nuclear Information System (INIS)

Kim, Jeong Rae; Choi, Sung Won; Jo, Seong Mu; Lee, Wha Seop; Kim, Byung Chul

2004-01-01

This paper discusses the preparation of microporous fibrous membranes from PVdF solutions with different polymer contents, using the electrospinning technique. Electrospun PVdF-based fibrous membranes with average fiber diameters (AFD's) of 0.45-1.38 μm have an apparent porosity and a mean pore size (MPS) of 80-89% and 1.1-4.3 μm, respectively. They exhibited a high uptake of the electrolyte solution (320-350%) and a high ionic conductivity of above 1 x 10 -3 s/cm at room temperature. Their ionic conductivity increased with the decrease in the AFD of the fibrous membrane due to its high electrolyte uptake. The interaction between the electrolyte molecules and the PVdF with a high crystalline content may have had a minor effect on the lithium ion transfer in the fibrous polymer electrolyte, unlike in a nanoporous gel polymer electrolyte. The fibrous polymer electrolyte that contained a 1 M LiPF 6 -EC/DMC/DEC (1/1/1 by weight) solution showed a high electrochemical stability of above 5.0 V, which increased with the decrease in the AFD The interfacial resistance (R i ) between the polymer electrolyte and the lithium electrode slightly increased with the storage time, compared with the higher increase in the interfacial resistance of other gel polymer electrolytes. The prototype cell (MCMB/PVdF-based fibrous electrolyte/LiCoO 2 ) showed a very stable charge-discharge behavior with a slight capacity loss under constant current and voltage conditions at the C/2-rate of 20 and 60 deg. C

Structure And Properties Of PVD Coatings Deposited On Cermets

Directory of Open Access Journals (Sweden)

Żukowska L.

2015-06-01

Full Text Available The main aim of the research is the investigation of the structure and properties of single-layer and gradient coatings of the type (Ti,AlN and Ti(C,N deposited by physical vapour deposition technology (PVD on the cermets substrate.

A microcontroller based tuning mechanism for the magnetron

International Nuclear Information System (INIS)

Khan, A.M.; Mahfooz, M.; Hanumaiah, B.; Ganesh; Siddappa, K.

2006-01-01

In this paper we report on a control system developed to tune the magnetron frequency to get the maximum beam pulse in the microtron (electron accelerator facility at Mangalore University). The control system so designed consists of a microcontroller, a phase locked loop (PLL) and a digital to analog converter (DAC) to control the magnetron frequency. The voltage value given by the microcontroller through the DAC decides the reference frequency. The PLL gives the error voltage whenever there is difference between the reference and the magnetron frequencies. The microcontroller unit tracks the error voltage and tunes the magnetron with the help of a tuner mechanism connected through a stepper motor. The microcontroller also monitors the beam current level and accordingly adjusts the reference frequency to successfully tune the magnetron. (author)

Properties of Pd nanograins in C-Pd composite films obtained by PVD method

Directory of Open Access Journals (Sweden)

Kozłowski M.

2015-09-01

Full Text Available Properties of palladium nanograins obtained by sedimentation of a soluted C-Pd film prepared by PVD method are presented. These properties were studied using SEM and TEM methods. Dissolved films were prepared by PVD method and after dissolving, they were fractionated to obtain different parts classified with palladium nanograins diameters. Several classes of diameters were determined: below 20 nm, between 20 and 100 nm and above 100 nm. The defects and triple junction were observed. Multishell carbonaceous structures were found in the big and medium size Pd nanograins.

Thermal cycling behaviour of lanthanum zirconate as EB-PVD thermal barrier coating

International Nuclear Information System (INIS)

Bobzin, K.; Lugscheider, E.; Bagcivan, N.

2006-01-01

Thermal cycling tests with two different EB-PVD thermal barrier coatings (TBC) were performed in a furnace cycle test. The results of these tests showed an increase of endurable cycle number when pyrochloric La 2 Zr 2 O 7 was used as TBC. 1865 cycles were reached with La 2 Zr 2 O 7 and 1380 cycles with 7 weigth-% yttria stabilised zirconia (YSZ) EB-PVD TBC. Additional investigation was made with scanning electron microscope (SEM) to investigate morphology and to determine chemical composition by electron dispersive x-ray spectroscopy (EDS) analysis. X-Ray diffraction was performed to analyze structural constitution of deposited coatings. (Abstract Copyright [2006], Wiley Periodicals, Inc.)

Additional ion bombardment in PVD processes generated by a superimposed pulse bias voltage

International Nuclear Information System (INIS)

Olbrich, W.; Kampschulte, G.

1993-01-01

The superimposed pulse bias voltage is a tool to apply an additional ion bombardment during deposition in physical vapour deposition (PVD) processes. It is generated by the combination of a d.c. ground voltage and a higher d.c. pulse voltage. Using a superimposed pulse bias voltage in ion-assisted PVD processes effects an additional all-around ion bombardment on the surface with ions of higher energy. Both metal and reactive or inert-gas ions are accelerated to the surface. The basic principles and important characteristics of this newly developed process such as ion fluxes or deposition rates are shown. Because of pulsing the high voltage, the deposition temperature does not increase much. The adhesion, structure, morphology and internal stresses are influenced by these additional ion impacts. The columnar growth of the deposited films could be suppressed by using the superimposed pulse bias voltage without increasing the deposition temperature. Different metallizations (Cr and Cu) produced by arc and sputter ion plating are investigated. Carbon-fibre-reinforced epoxy are coated with PVD copper films for further treatment in electrochemical processes. (orig.)

CEERI-CAT joint venture for development of accelerator magnetrons

International Nuclear Information System (INIS)

Prasad, Sharda; Kaushik, S.C.; Mahesh Kumar; Chaudhary, P.; Shrivastava, Purushottam; Wanmode, Y.; Hannurkar, P.R.

2003-01-01

LINAC and Microtron systems for electron acceleration up to few tens of MeV, requires pulsed RF sources such as magnetron and klystron in S-Band frequency range with peak power in the range of few MW. The major emphasis under this program was to develop critical technologies involved in the development of 2 MW magnetron. This paper discusses the development of 2 MW magnetron along with critical technologies involved and test facilities developed by CAT for testing of this magnetron

Microstructural, mechanical and oxidation features of NiCoCrAlY coating produced by plasma activated EB-PVD

International Nuclear Information System (INIS)

He, Jian; Guo, Hongbo; Peng, Hui; Gong, Shengkai

2013-01-01

NiCoCrAlY coatings produced by electron beam-physical vapor deposition (EB-PVD) have been extensively used as the oxidation resistance coatings or suitable bond coats in thermal barrier coating (TBC) system. However, the inherent imperfections caused by EB-PVD process degrade the oxidation resistance of the coatings. In the present work, NiCoCrAlY coatings were creatively produced by plasma activated electron beam-physical vapor deposition (PA EB-PVD). The novel coatings showed a terraced substructure on the surface of each grain due to the increased energy of metal ions and enhanced mobility of adatoms. Also a strong (1 1 1) crystallographic texture of γ/γ′ grains was observed. The toughness of the coatings got remarkably improved compared with the coatings deposited by conventional EB-PVD and the oxidation behavior at 1373 K showed that the novel coatings had excellent oxidation resistance. The possible mechanism was finally discussed.

Al_2O_3/PVdF-HFP-CMC/PE separator prepared using aqueous slurry and post-hot-pressing method for polymer lithium-ion batteries with enhanced safety

International Nuclear Information System (INIS)

Deng, Yaoming; Song, Xiaona; Ma, Zhen; Zhang, Xinhe; Shu, Dong; Nan, Junmin

2016-01-01

A composite separator is prepared to improve the safety of lithium ion batteries (LIBs) based on a gravure coating aqueous slurry and post-hot-pressing method. An environmentally friendly aqueous slurry with an Al_2O_3 ceramic holder and polyvinylidene difluoride-hexafluoropropylene (PVdF-HFP) and carboxymethyl cellulose (CMC) dual-binders is coated on a polyolefin (PE) substrate to form a prototype Al-PHC/PE separator. Then, after assembling the separator in the batteries and hot-pressing at 70 °C and 0.8 MPa for 3 h, the granular PVdF-HFP is transformed into a colloidal structure containing an electrolyte, which can binds the Al_2O_3 nanoparticles together and increases the battery hardness. Compared with a PE separator (9 μm), the Al-PHC/PE-2 separator (12 μm, with a Al_2O_3/PVdF-HFP weight ratio of 7/3) displays a comparative ionic conductivity of 9.3 × 10"−"4 S cm"−"2 and exhibits no obvious thermal deformation at 110 °C for 60 min. All of the batteries assembled with Al-PHC/PE-2 separators passed nail penetration and impact tests. In addition, the capacity retention increases from 83.4% to 87.6% when the battery is assembled with Al-PHC/PE-2 instead of a PE separator and charge-discharged at 0.7C/1.0C for 350 cycles. The enhanced safety and cycle performance indicate the promising prospect of Al-PHC/PE separators in LIBs.

Ordered metal nanotube arrays fabricated by PVD.

Science.gov (United States)

Marquez, F; Morant, C; Campo, T; Sanz, J M; Elizalde, E

2010-02-01

In this work we report a simple method to fabricate ordered arrays of metal nanotubes. This method is based on the deposition of a metal by PVD onto an anodized aluminum oxide (AAO) template. The dimensions of the synthesized nanotubes depend both on the AAO template and on the deposited metal. In fact, it is observed that the aspect ratios of the nanotubes clearly depend significantly on the metal, ranging from 0.6 (Fe) to at least 3 (Zr).

Life assessment of PVD based hard coatings by linear sweep voltammetry for high performance industrial application

International Nuclear Information System (INIS)

Malik, M.; Alam, S.; Irfan, M.; Hassan, Z.

2006-01-01

PVD based hard coatings have remarkable achievements in order to improve Tribological and surface properties of coating tools and dies. As PVD based hard coatings have a wide range of industrial applications especially in aerospace and automobile parts where they met different chemical attacks and in order to improve industrial performance these coatings must provide an excellent resistance against corrosion, high temperature oxidation and chemical reaction. This paper focuses on study of behaviour of PVD based hard coatings under different corrosive environments like as H/sub 2/SO/sub 4/, HCl, NaCl, KCl, NaOH etc. Corrosion rate was calculate under linear sweep voltammetry method where the Tafel extrapolation curves used for continuously monitoring the corrosion rate. The results show that these coatings have an excellent resistance against chemical attack. (author)

Plasma Spray-Physical Vapor Deposition (PS-PVD) of Ceramics for Protective Coatings

Science.gov (United States)

Harder, Bryan J.; Zhu, Dongming

2011-01-01

In order to generate advanced multilayer thermal and environmental protection systems, a new deposition process is needed to bridge the gap between conventional plasma spray, which produces relatively thick coatings on the order of 125-250 microns, and conventional vapor phase processes such as electron beam physical vapor deposition (EB-PVD) which are limited by relatively slow deposition rates, high investment costs, and coating material vapor pressure requirements. The use of Plasma Spray - Physical Vapor Deposition (PS-PVD) processing fills this gap and allows thin (deposited and multilayer coatings of less than 100 microns to be generated with the flexibility to tailor microstructures by changing processing conditions. Coatings of yttria-stabilized zirconia (YSZ) were applied to NiCrAlY bond coated superalloy substrates using the PS-PVD coater at NASA Glenn Research Center. A design-of-experiments was used to examine the effects of process variables (Ar/He plasma gas ratio, the total plasma gas flow, and the torch current) on chamber pressure and torch power. Coating thickness, phase and microstructure were evaluated for each set of deposition conditions. Low chamber pressures and high power were shown to increase coating thickness and create columnar-like structures. Likewise, high chamber pressures and low power had lower growth rates, but resulted in flatter, more homogeneous layers

Interfacial fatigue stress in PVD TiN coated tool steels under rolling contact fatigue conditions

OpenAIRE

Carvalho, N.J.M.; Huis in ’t Veld, A.J.; Hosson, J.Th. De

1998-01-01

Titanium–nitrogen (TiN) films were Physical Vapour Deposited (PVD) on tool steel substrates with different hardness and surface roughness, in a Bai 640R unit using a triode ion plating (e-gun) with a high plasma density. The coated substrates were submitted to a rolling contact fatigue test technique (modified pin-on-ring test) to obtain some clarifications of the mechanism of interfacial failure. Tests were run using PVD-coated rings finished by polishing or grinding to produce different sur...

Woman and partner-perceived partner responses predict pain and sexual satisfaction in provoked vestibulodynia (PVD) couples.

Science.gov (United States)

Rosen, Natalie O; Bergeron, Sophie; Leclerc, Bianca; Lambert, Bernard; Steben, Marc

2010-11-01

Provoked vestibulodynia (PVD) is a highly prevalent vulvovaginal pain condition that results in significant sexual dysfunction, psychological distress, and reduced quality of life. Although some intra-individual psychological factors have been associated with PVD, studies to date have neglected the interpersonal context of this condition. We examined whether partner responses to women's pain experience-from the perspective of both the woman and her partner-are associated with pain intensity, sexual function, and sexual satisfaction. One hundred ninety-one couples (M age for women=33.28, standard deviation [SD]=12.07, M age for men=35.79, SD=12.44) in which the woman suffered from PVD completed the spouse response scale of the Multidimensional Pain Inventory, assessing perceptions of partners' responses to the pain. Women with PVD also completed measures of pain, sexual function, sexual satisfaction, depression, and dyadic adjustment. Dependent measures were women's responses to: (i) a horizontal analog scale assessing the intensity of their pain during intercourse; (ii) the Female Sexual Function Index; and (iii) the Global Measure of Sexual Satisfaction Scale. Controlling for depression, higher solicitous partner responses were associated with higher levels of women's vulvovaginal pain intensity. This association was significant for partner-perceived responses (β=0.29, Psexual function and dyadic adjustment, woman-perceived greater solicitous partner responses (β=0.16, P=0.02) predicted greater sexual satisfaction. Partner-perceived responses did not predict women's sexual satisfaction. Partner responses were not associated with women's sexual function. Findings support the integration of dyadic processes in the conceptualization and treatment of PVD by suggesting that partner responses to pain affect pain intensity and sexual satisfaction in affected women. © 2010 International Society for Sexual Medicine.

PEGDA/PVdF/F127 gel type polymer electrolyte membranes for lithium secondary batteries

Energy Technology Data Exchange (ETDEWEB)

Wang, Yan-Jie; Kim, Dukjoon [Department of Chemical Engineering, Polymer Technology Institute, Sungkyunkwan University, Suwon, Kyunggi 440-746 (Korea)

2007-03-30

A novel porous gel polymer electrolyte (GPE) membrane based on poly(ethylene glycol) diacrylate (PEGDA), poly(vinylidene fluoride) (PVdF), and polyethylene oxide-co-polypropylene oxide-co-polyethylene oxide (PEO-PPO-PEO, F127) was fabricated by a phase inversion technique. The PEGDA cross-linking oligomer could be randomly mixed with unraveled PVdF polymer chains to form the interpenetrating polymer network (IPN) structure. Several experimental techniques including infrared (IR) spectra, differential scanning calorimetry (DSC), thermogravimetric analyzer (TGA), scanning electron microscopy (SEM), electrochemical impedance spectroscopy (EIS) and potentiostat/galvanostat were employed to investigate the characteristics of the polymer membranes. PEGDA and F127 influenced the porous size and structure. The mechanical strength and flexibility of the membrane were controlled by its composition. The membrane with the composition of PEGDA/PVdF/F127 (0/4/4) showed the highest electrolyte uptake of 152.6% and the maximum ionic conductivity of 2.0 x 10{sup -3} S cm{sup -1} at room temperature. All GPEs prepared in this study were electrochemically stable up to 4.5 V. (author)

IBA analysis and corrosion resistance of TiAlPtN/TiAlN/TiAl multilayer films deposited over a CoCrMo using magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Canto, C.E., E-mail: carloscanto2012@yahoo.com.mx [Instituto de Física, Universidad Nacional Autónoma de México, Apartado Postal 20-364, 01000 México D.F. (Mexico); Andrade, E.; Lucio, O. de; Cruz, J.; Solís, C. [Instituto de Física, Universidad Nacional Autónoma de México, Apartado Postal 20-364, 01000 México D.F. (Mexico); Rocha, M.F. [ESIME-Z, IPN, U.P. ALM, Gustavo A. Madero, C.P. 07738 México D.F. (Mexico); Alemón, B. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jalisco 45101 (Mexico); Tecnológico de Monterrey, Av. General Ramón Corona 2514, Col. Nuevo México, Zapopan, Jalisco 45201 (Mexico); Flores, M. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jalisco 45101 (Mexico); Huegel, J.C. [Tecnológico de Monterrey, Av. General Ramón Corona 2514, Col. Nuevo México, Zapopan, Jalisco 45201 (Mexico)

2016-03-15

The corrosion resistance and the elemental profile of multilayer coatings of TiAlPtN/TiAlN/TiAl synthesized by Physical Vapor Deposition (PVD) reactive magnetron sputtering over a CoCrMo alloy substrate in 10 periods of 30 min each were analyzed and compared to those of the substrate alone and to that of a TiAlPtN single layer coating of the same thickness. The objective of the present work was to create multilayers with different amounts of Pt to enhance the corrosion resistance of a biomedical alloy of CoCrMo. Corrosion tests were performed using Simulated Body Fluid (SBF) using potentiodynamic polarization tests at typical body temperature. The elemental composition and thickness of the coatings were evaluated with the combination of two ion beam analysis (IBA) techniques: a Rutherford Backscattering Spectroscopy (RBS) with alpha beam and a Nuclear Reaction Analysis with a deuteron beam.

IBA analysis and corrosion resistance of TiAlPtN/TiAlN/TiAl multilayer films deposited over a CoCrMo using magnetron sputtering

International Nuclear Information System (INIS)

Canto, C.E.; Andrade, E.; Lucio, O. de; Cruz, J.; Solís, C.; Rocha, M.F.; Alemón, B.; Flores, M.; Huegel, J.C.

2016-01-01

The corrosion resistance and the elemental profile of multilayer coatings of TiAlPtN/TiAlN/TiAl synthesized by Physical Vapor Deposition (PVD) reactive magnetron sputtering over a CoCrMo alloy substrate in 10 periods of 30 min each were analyzed and compared to those of the substrate alone and to that of a TiAlPtN single layer coating of the same thickness. The objective of the present work was to create multilayers with different amounts of Pt to enhance the corrosion resistance of a biomedical alloy of CoCrMo. Corrosion tests were performed using Simulated Body Fluid (SBF) using potentiodynamic polarization tests at typical body temperature. The elemental composition and thickness of the coatings were evaluated with the combination of two ion beam analysis (IBA) techniques: a Rutherford Backscattering Spectroscopy (RBS) with alpha beam and a Nuclear Reaction Analysis with a deuteron beam.

Sintering and microstructure evolution of columnar nickel-based superalloy sheets prepared by EB-PVD

International Nuclear Information System (INIS)

Chen, S.; Qu, S.J.; Liang, J.; Han, J.C.

2010-01-01

Research highlights: → EB-PVD technology is commonly used to deposit thermal barrier coatings (TBCs) and columnar structure is commonly seen in EB-PVD condensates. The unique columnar structure can provide outstanding resistance against thermal shock and mechanical strains for TBCs. However, a number of researchers have found that the columnar structure can affect the mechanical properties of EB-PVD alloy thin sheet significantly. As yet, works on how to reduce this kind of effects are seldom done. In the present article, we tried to reveal the sintering effects on microstructure evolution and mechanical properties of columnar Ni-based superalloy sheet. The results suggests that after sintering, the columnar structure degrades. Degradation depends on sintering temperature and time. Both the ultimate tensile strength and the elongation percentage are effectively improved after sintering. - Abstract: A ∼0.15 mm-thick columnar nickel-based superalloy sheet was obtained by electron beam physical vapor deposition (EB-PVD). The as-deposited alloy sheet was sintered at different conditions. The microstructure of the specimens before and after sintering was characterized by using scanning electron microscopy. An X'Pert texture facility was used to determine the crystallographic orientation of the as-deposited alloy sheet. The phase transformation was investigated by X-ray diffraction. Tensile tests were conducted at room temperature on as-deposited and sintered specimens. The results show that the as-deposited sheet is composed of typical columnar structures. After sintering, however, the columnar structure degrades. The degradation depends on sintering temperature and time. Both the ultimate tensile strength and the elongation percentage are effectively improved after sintering.

Modeling and experimental studies of a side band power re-injection locked magnetron

Science.gov (United States)

Ye, Wen-Jun; Zhang, Yi; Yuan, Ping; Zhu, Hua-Cheng; Huang, Ka-Ma; Yang, Yang

2016-12-01

A side band power re-injection locked (SBPRIL) magnetron is presented in this paper. A tuning stub is placed between the external injection locked (EIL) magnetron and the circulator. Side band power of the EIL magnetron is reflected back to the magnetron. The reflected side band power is reused and pulled back to the central frequency. A phase-locking model is developed from circuit theory to explain the process of reuse of side band power in SBPRIL magnetron. Theoretical analysis proves that the side band power is pulled back to the central frequency of the SBPRIL magnetron, then the amplitude of the RF voltage increases and the phase noise performance is improved. Particle-in-cell (PIC) simulation of a 10-vane continuous wave (CW) magnetron model is presented. Computer simulation predicts that the frequency spectrum’s peak of the SBPRIL magnetron has an increase of 3.25 dB compared with the free running magnetron. The phase noise performance at the side band offset reduces 12.05 dB for the SBPRIL magnetron. Besides, the SBPRIL magnetron experiment is presented. Experimental results show that the spectrum peak rises by 14.29% for SBPRIL magnetron compared with the free running magnetron. The phase noise reduces more than 25 dB at 45-kHz offset compared with the free running magnetron. Project supported by the National Basic Research Program of China (Grant No. 2013CB328902) and the National Natural Science Foundation of China (Grant No. 61501311).

Pulsed Power Generators For Two-section Lia Relativistic Magnetron Driver

CERN Document Server

Agafonov, A V; Pevchev, V P

2004-01-01

Two prototypes of pulsed power generators for a two-sectional LIA - specialized driver of a relativistic magnetron were constructed and tested. The driver for the double-sided powering of a relativistic magnetron consists of two identical sets of induction modules (two sections of LIA) with inner electrodes - vacuum adders connected to both sides of a coaxial magnetron. It provides the symmetric power flowing in a magnetron and a possibility of localising of the electron flow in magnetron interaction region. The first generator designed for a small-scale laboratory installation provides the output pulses of 100 ns in duration with voltage amplitude of 50 kV at repetition rate of 1 pps. The construction of the generator is based on the application of experimental capacitor banks designed as a pulse forming line with the next parameters: charging voltage - 80 kV, impedance - 1,7 Ohm, pulse duration - 80 ns at a matched load. The second generator was designed for 1 MV integrated LIA - magnetron system. It cons...

Controlling Dielectric and Magnetic Properties of PVdF/Magnetite Nanocomposite Fibre Webs

Directory of Open Access Journals (Sweden)

A. P. Venugopal

2014-01-01

Full Text Available The ability of filtration and separation media containing fibres to remove impurities from oil, water, and blood can be enhanced using magnetic fields. The ability to regulate the dielectric and magnetic behaviour of fibrous webs in terms of superparamagnetic or ferromagnetic properties by adjusting material composition is fundamental to meeting end-use requirements. Electrospun fibres were produced from PVdF (polyvinylidene fluoride and nanomagnetite (Fe3O4 nanoparticles from solutions of PVdF in dimethylacetamide containing Fe3O4 nanoparticle contents ranging from 3 to 10 wt%. Fibre dimensions, morphology, and nanoparticle agglomeration were characterised by environmental scanning electron microscopy (ESEM and field emission gun transmission electron microscopy (FEGTEM. Dielectric behaviour of the fibre webs was influenced by web porosity and the Fe3O4 nanoparticle content. Impedance analysis of the webs indicated an increase in dielectric constant of ∼80% by the addition of 10 wt% Fe3O4 nanoparticles compared to 100 wt% PVdF. The dielectric constants of the webs were compared with those obtained from the theoretical mixing models of Maxwell and Lichtenecker. Vibrating sample magnetometer (VSM magnetisation measurements indicated a blocking temperature above 300 K suggesting ferrimagnetic rather than superparamagnetic behaviour as a result of Fe3O4 nanoparticle agglomeration within fibres.

Effect of PbI2 deposition rate on two-step PVD/CVD all-vacuum prepared perovskite

International Nuclear Information System (INIS)

Ioakeimidis, Apostolos; Christodoulou, Christos; Lux-Steiner, Martha; Fostiropoulos, Konstantinos

2016-01-01

In this work we fabricate all-vacuum processed methyl ammonium lead halide perovskite by a sequence of physical vapour deposition of PbI 2 and chemical vapour deposition (CVD) of CH 3 NH 3 I under a static atmosphere. We demonstrate that for higher deposition rate the (001) planes of PbI 2 film show a higher degree of alignment parallel to the sample's surface. From X-ray diffraction data of the resulted perovskite film we derive that the intercalation rate of CH 3 NH 3 I is fostered for PbI 2 films with higher degree of (001) planes alignment. The stoichiometry of the produced perovskite film is also studied by Hard X-ray photoelectron spectroscopy measurements. Complete all-vacuum perovskite solar cells were fabricated on glass/ITO substrates coated by an ultra-thin (5 nm) Zn-phthalocyanine film as hole selective layer. A dependence of residual PbI 2 on the solar cells performance is displayed, while photovoltaic devices with efficiency up to η=11.6% were achieved. - Graphical abstract: A two-step PVD/CVD processed perovskite film with the CVD intercalation rate of CH 3 NCH 3 molecules been fostered by increasing the PVD rate of PbI 2 and prolonging the CVD time. - Highlights: • A simple PVD/CVD process for perovskite film production. • Increased PVD rate yields better alignment of the PbI 2 (001) crystallite planes. • CH 3 NH 3 I intercalation process fostered by increased PbI 2 PVD rate. • Stoichiometric CH 3 NH 3 PbI 3 suitable as absorber in photovoltaic applications • Reduced PbI 2 residue at the bottom of CH 3 NH 3 PbI 3 improves device performance.

Development of new cylindrical magnetrons for industrial use

International Nuclear Information System (INIS)

Clayton, B.

2000-09-01

A number of alternative techniques were considered and tested with a view to the construction of a cylindrical sputtering device. This device was required to be capable of depositing tribological coatings inside approximately cylindrical substrates of diameters less than 100mm, in an industrial situation. A cylindrical magnetron device was designed, and constructed as a prototype, using a magnetic assembly inside a cylindrical target with outside diameter (o.d.) 40mm. Two alternative magnetic assemblies were tested, and found to have complimentary advantages. The magnetron characteristics of the device were tested, as were key properties (such as adhesion level and hardness) of the coatings deposited. In all cases good results were obtained. A 22mm o.d. device based on the same design was shown to operate, but with less satisfactory characteristics. In an attempt to improve the miniaturised design, the feasibility of gas cooling (rather than water cooling) the cylindrical magnetron was demonstrated. A system incorporating four 40mm o.d. cylindrical magnetrons was designed, constructed and briefly tested. This was intended to prove the feasibility of using a multi-magnetron system to reduce the cost to coat. Its dimensions and design were tailored to an industrially specified engine block. In use the plasma rings formed on the 40mm magnetron target surfaces during operation were found to be of unequal intensities, especially on the shorter magnetron design used in the four-fold system. In an attempt to tackle this problem, a finite element model of the magnetic field generated by the magnetic assembly was built, run and verified. Changes were made to this model, and a new .magnet assembly was built and tested based on the results obtained. This did not lead to a final solution of the problem, but has set bounds within which the solution must lie. (author)

Inverted relativistic magnetron with a single axial output

International Nuclear Information System (INIS)

Ballard, W.P.; Earley, L.M.; Wharton, C.B.

1986-01-01

A twelve vane, 1 MV, S-band magnetron has been designed and tested. An inverted design was selected to minimize the parasitic axial electron losses. The stainless steel anode is approximately one wavelength long. One end is partially short-circuited to rf, while the other end has a mode transformer to couple the 3.16 GHz π-mode out into a TM 01 circular waveguide. The magnetron has a loaded output Q of about 100. Operation at 1 MV, 0.31 T, 5 kA routinely produces approx.150 MW peak rms and 100 MW average rms with pulse lengths adjustable from 5 to 70 ns. The microwave power pulse has a rise time of approx.2 ns. The output power is diagnosed using four methods: calorimetry, two circular-waveguide directional couplers installed on the magnetron, two transmitting-receiving systems, and gaseous breakdown. Operation at other voltages and magnetic fields shows that the oscillation frequency is somewhat dependent on the magnetron current. Frequency changes of approx.20 MHz/kA occur as the operating conditions are varied. A series of experiments varying the anode conductivity, the electron emission profile, and the output coupling transformer design showed that none of these significantly increased the output power. Therefore, we have concluded that this magnetron operates in saturation. Because of the anode lifetime and repeatability, this magnetron has the potential to be repetitively pulsed. 36 refs., 16 figs

Hybrid diffusive/PVD treatments to improve the tribological resistance of Ti-6Al-4V.

Science.gov (United States)

Marin, E; Offoiach, R; Lanzutti, A; Regis, M; Fusi, S; Fedrizzi, L

2014-01-01

Titanium alloys are nowadays used for a wide range of biomedical applications thanks to their combination of high mechanical resistance, high corrosion resistance and biocompatibility. Nevertheless, the applicability of titanium alloys is sometimes limited due to their low microhardness and tribological resistance. Thus the titanium alloys cannot be successfully applied to prosthetic joint couplings. A wide range of surface treatments, in particular PVD coatings such as CrN and TiN, have been used in order to improve the tribological behaviour of titanium alloys. However, the low microhardness of the titanium substrate often results in coating failure due to cracks and delamination. For this reason, hybrid technologies based on diffusive treatments and subsequent PVD coatings may improve the overall coating resistance. In this work, conventional PVD coatings of CrN or TiCN, deposited on Titanium Grade 5, were characterized and then combined with a standard thermal diffusive nitriding treatment in order to improve the tribological resistance of the titanium alloys and avoid coating delamination. The different treatments were studied by means of scanning electron microscopy both on the sample surface and in cross-section. In-depth composition profiles were obtained using glow discharge optical emission spectrometry (GDOES) and localized energy dispersive X-ray diffraction on linear scan-lines. The microhardness and adhesion properties of the different treatments were evaluated using Vickers microhardness tests at different load conditions. The indentations were observed by means of SEM in order to evaluate delaminated areas and the crack's shape and density. The tribological behaviour of the different treatments was tested in dry conditions and in solution, in alternate pin-on-flat configuration, with a frequency of 0.5 Hz. After testing, the surface was investigated by means of stylus profilometry and SEM both on the surface and in cross-section. The standalone PVD

NiCoCrAl/YSZ laminate composites fabricated by EB-PVD

International Nuclear Information System (INIS)

Shi Guodong; Wang Zhi; Liang Jun; Wu Zhanjun

2011-01-01

Highlights: → The metal-ceramic laminate composites were fabricated by EB-PVD. → Both metal and ceramic layers consisted of straight columns with banded structures. → Columnar grain size was limited by the periodic layer interfaces in the laminates. → Effect of columns on fracture property was decreased by limiting layer thickness. → Laminates showed greater specific strength than monolithic metal foil. - Abstract: Two NiCoCrAl/YSZ laminate composites (A and B) with different metal-layer thickness (∼35 μm and 14 μm, respectively) were fabricated by electron beam physical vapor deposition (EB-PVD). Their microstructure was examined and their mechanical properties were compared with the 289 μm thick NiCoCrAl monolithic foil produced by EB-PVD. Both the YSZ and NiCoCrAl layers of the laminate composites had columnar grain structure. But the periodic layer interfaces limited the columnar grain size. Some pores between the columns were also observed. It was found that the strength of the laminate A was equal approximately to that of the NiCoCrAl monolithic foil, and that laminate B had the greater strength. Moreover, the density of the foils decreased with the increasing thickness ratio of YSZ/NiCoCrAl layers and the increasing the layer number. Thus, comparing with the NiCoCrAl monolithic foil, the NiCoCrAl/YSZ laminate composites not only had the equal or greater strength, but also had the much greater specific strength.

Highly selective etching of silicon nitride to physical-vapor-deposited a-C mask in dual-frequency capacitively coupled CH2F2/H2 plasmas

International Nuclear Information System (INIS)

Kim, J. S.; Kwon, B. S.; Heo, W.; Jung, C. R.; Park, J. S.; Shon, J. W.; Lee, N.-E.

2010-01-01

A multilevel resist (MLR) structure can be fabricated based on a very thin amorphous carbon (a-C) layer ( congruent with 80 nm) and Si 3 N 4 hard-mask layer ( congruent with 300 nm). The authors investigated the selective etching of the Si 3 N 4 layer using a physical-vapor-deposited (PVD) a-C mask in a dual-frequency superimposed capacitively coupled plasma etcher by varying the process parameters in the CH 2 F 2 /H 2 /Ar plasmas, viz., the etch gas flow ratio, high-frequency source power (P HF ), and low-frequency source power (P LF ). They found that under certain etch conditions they obtain infinitely high etch selectivities of the Si 3 N 4 layers to the PVD a-C on both the blanket and patterned wafers. The etch gas flow ratio played a critical role in determining the process window for infinitely high Si 3 N 4 /PVD a-C etch selectivity because of the change in the degree of polymerization. The etch results of a patterned ArF photoresisit/bottom antireflective coating/SiO x /PVD a-C/Si 3 N 4 MLR structure supported the idea of using a very thin PVD a-C layer as an etch-mask layer for the Si 3 N 4 hard-mask pattern with a pattern width of congruent with 80 nm and high aspect ratio of congruent with 5.

Dependence of plasma characteristics on dc magnetron sputter parameters

International Nuclear Information System (INIS)

Wu, S.Z.

2005-01-01

Plasma discharge characteristics of a dc magnetron system were measured by a single Langmuir probe at the center axis of the dual-side process chamber. Plasma potential, floating potential, electron and ion densities, and electron temperature were extracted with varying dc power and gas pressure during sputter deposition of a metal target; strong correlations were shown between these plasma parameters and the sputter parameters. The electron density was controlled mostly by secondary electron generation in constant power mode, while plasma potential reflects the confinement space variation due to change of discharge voltage. When discharge pressure was varied, plasma density increases with the increased amount of free stock molecules, while electron temperature inversely decreased, due to energy-loss collision events. In low-pressure discharges, the electron energy distribution function measurements show more distinctive bi-Maxwellian distribution, with the fast electron temperature gradually decreases with increased gas pressure

A PLL based automated magnetron tuning mechanism for electron accelerators

International Nuclear Information System (INIS)

Khan, A M; Mahfooz, Mohammed; Sanjeev, Ganesh

2008-01-01

In this paper we report on a control system developed to tune the magnetron frequency to get the maximum beam pulse in a Microtron (an electron accelerator facility at Mangalore University). The control system so designed consists of a Microcontroller Unit (MCU), a Phase Locked Loop (PLL) and a Digital to Analog Converter (DAC) to track and tune the magnetron frequency. A PLL is used to track the deviation of the magnetron output frequency, and by monitoring the reflected wave voltage level, the microcontroller unit tunes the magnetron with the help of a tuner mechanism connected through a stepper motor.

A PLL based automated magnetron tuning mechanism for electron accelerators

Energy Technology Data Exchange (ETDEWEB)

Khan, A M; Mahfooz, Mohammed [Dept. of Electronics, Mangalore University, Mangalagangotri, Karnataka State, India - 574 199 (India); Sanjeev, Ganesh [Microtron Centre, Mangalore University, Mangalagangotri, Karnataka State, India - 574 199 (India)], E-mail: mahfooz_81@yahoo.com

2008-09-15

In this paper we report on a control system developed to tune the magnetron frequency to get the maximum beam pulse in a Microtron (an electron accelerator facility at Mangalore University). The control system so designed consists of a Microcontroller Unit (MCU), a Phase Locked Loop (PLL) and a Digital to Analog Converter (DAC) to track and tune the magnetron frequency. A PLL is used to track the deviation of the magnetron output frequency, and by monitoring the reflected wave voltage level, the microcontroller unit tunes the magnetron with the help of a tuner mechanism connected through a stepper motor.

Phase and Frequency Locked Magnetrons for SRF Sources

International Nuclear Information System (INIS)

Neubauer, M.; Johnson, R.P.; Popovic, M.; Moretti, A.

2009-01-01

Magnetrons are low-cost highly-efficient microwave sources, but they have several limitations, primarily centered about the phase and frequency stability of their output. When the stability requirements are low, such as for medical accelerators or kitchen ovens, magnetrons are the very efficient power source of choice. But for high energy accelerators, because of the need for frequency and phase stability - proton accelerators need 1-2 degrees source phase stability, and electron accelerators need .1-.2 degrees of phase stability - they have rarely been used. We describe a novel variable frequency cavity technique which will be utilized to phase and frequency lock magnetrons.

Microstructural investigations of interfaces in PVD TiN coated tool steels

NARCIS (Netherlands)

Carvalho, NJM; in't Veld, AJH; De Hosson, JTM; Lejcek, P; Paidar,

1999-01-01

The microstructure of PVD TiN coated tools steels composites has been investigated by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). It was found that the microstructure of the coatings consists of a dense fibrous structure typical of a zone T structure. When the

Prefabricated Vertical Drain (PVD) and Deep Cement Mixing (DCM)/Stiffened DCM (SDCM) techniques for soft ground improvement

Science.gov (United States)

Bergado, D. T.; Long, P. V.; Chaiyaput, S.; Balasubramaniam, A. S.

2018-04-01

Soft ground improvement techniques have become most practical and popular methods to increase soil strength, soil stiffness and reduce soil compressibility including the soft Bangkok clay. This paper focuses on comparative performances of prefabricated vertical drain (PVD) using surcharge, vacuum and heat preloading as well as the cement-admixed clay of Deep Cement Mixing (DCM) and Stiffened DCM (SDCM) methods. The Vacuum-PVD can increase the horizontal coefficient of consolidation, Ch, resulting in faster rate of settlement at the same magnitudes of settlement compared to Conventional PVD. Several field methods of applying vacuum preloading are also compared. Moreover, the Thermal PVD and Thermal Vacuum PVD can increase further the coefficient of horizontal consolidation, Ch, with the associated reduction of kh/ks values by reducing the drainage retardation effects in the smear zone around the PVD which resulted in faster rates of consolidation and higher magnitudes of settlements. Furthermore, the equivalent smear effect due to non-uniform consolidation is also discussed in addition to the smear due to the mechanical installation of PVDs. In addition, a new kind of reinforced deep mixing method, namely Stiffened Deep Cement Mixing (SDCM) pile is introduced to improve the flexural resistance, improve the field quality control, and prevent unexpected failures of the Deep Cement Mixing (DCM) pile. The SDCM pile consists of DCM pile reinforced with the insertion of precast reinforced concrete (RC) core. The full scale test embankment on soft clay improved by SDCM and DCM piles was also analysed. Numerical simulations using the 3D PLAXIS Foundation finite element software have been done to understand the behavior of SDCM and DCM piles. The simulation results indicated that the surface settlements decreased with increasing lengths of the RC cores, and, at lesser extent, increasing sectional areas of the RC cores in the SDCM piles. In addition, the lateral movements

Effect of PbI{sub 2} deposition rate on two-step PVD/CVD all-vacuum prepared perovskite

Energy Technology Data Exchange (ETDEWEB)

Ioakeimidis, Apostolos; Christodoulou, Christos; Lux-Steiner, Martha; Fostiropoulos, Konstantinos, E-mail: fostiropoulos@helmholtz-berlin.de

2016-12-15

In this work we fabricate all-vacuum processed methyl ammonium lead halide perovskite by a sequence of physical vapour deposition of PbI{sub 2} and chemical vapour deposition (CVD) of CH{sub 3}NH{sub 3}I under a static atmosphere. We demonstrate that for higher deposition rate the (001) planes of PbI{sub 2} film show a higher degree of alignment parallel to the sample's surface. From X-ray diffraction data of the resulted perovskite film we derive that the intercalation rate of CH{sub 3}NH{sub 3}I is fostered for PbI{sub 2} films with higher degree of (001) planes alignment. The stoichiometry of the produced perovskite film is also studied by Hard X-ray photoelectron spectroscopy measurements. Complete all-vacuum perovskite solar cells were fabricated on glass/ITO substrates coated by an ultra-thin (5 nm) Zn-phthalocyanine film as hole selective layer. A dependence of residual PbI{sub 2} on the solar cells performance is displayed, while photovoltaic devices with efficiency up to η=11.6% were achieved. - Graphical abstract: A two-step PVD/CVD processed perovskite film with the CVD intercalation rate of CH{sub 3}NCH{sub 3} molecules been fostered by increasing the PVD rate of PbI{sub 2} and prolonging the CVD time. - Highlights: • A simple PVD/CVD process for perovskite film production. • Increased PVD rate yields better alignment of the PbI{sub 2} (001) crystallite planes. • CH{sub 3}NH{sub 3}I intercalation process fostered by increased PbI{sub 2} PVD rate. • Stoichiometric CH{sub 3}NH{sub 3}PbI{sub 3} suitable as absorber in photovoltaic applications • Reduced PbI{sub 2} residue at the bottom of CH{sub 3}NH{sub 3}PbI{sub 3} improves device performance.

[Efficacy of PVD regimen combined with IMRT for early-stage extranodal nasal NK/T-cell lymphoma].

Science.gov (United States)

Zhang, Y; Huang, Y H; Hu, Y F; Liu, Q L; Wu, T

2017-07-11

Objective: To evaluate the efficacy of PVD chemo-regimen (Pegaspargase, vincristine and dexamethasone) combined with intensity-modulated radiotherapy (IMRT) for patients with early-stage extranodal nasal NK/T-cell lymphoma (ENKL). Methods: Clinical data of 52 patients with early-stage ENKL were collected during May 2010 and June 2015 in Department of Lymphoma, Cancer Hospital of Guizhou Medical University, and these patients firstly received a concurrent chemoradiotherapy of two-cycle of PVD and IMRT (gross tumor volume primary: 12.6-59.4 Gy) and then 2 to 4 cycles of PVD as subsequent chemotherapy, the efficacy and adverse responses were retrospectively analyzed and observed. Results: Follow-up stopped until December 2015, complete remission was seen in 44 cases (84.6%) and partial remission 7 cases (13.5%), out of 52 cases. A total of 1 case died of progression disease during treatment and within 1 year after treatment, 1 case died of pulmonary infection within 1 week after treatment, 2 cases survived with tumor; so the objective response rate and clinical benefit rate were both 98.1%, 1-year, 2-year and 3-year overall survival rates and progression free survival rates were all 93.6%, 1-year and 2-year disease free survival rates were both 90.3%; the correlation analysis showed that the radiotherapy dose was related to the curative effect ( P PVD regimen and IMRT have a good therapeutic effect and adverse response can be tolerated.

Incorporation of N in TiO{sub 2} films grown by DC-reactive magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Serio, S. [CEFITEC, Departamento de Fisica, Faculdade de Ciencias e Tecnologia da Universidade Nova de Lisboa, 2829-516 Caparica (Portugal); Melo Jorge, M.E. [CCMM, Departamento de Quimica e Bioquimica, Faculdade de Ciencias da Universidade de Lisboa, Campo Grande C8, 1749-016 Lisboa (Portugal); Nunes, Y. [CEFITEC, Departamento de Fisica, Faculdade de Ciencias e Tecnologia da Universidade Nova de Lisboa, 2829-516 Caparica (Portugal); Barradas, N.P. [Instituto Tecnologico e Nuclear and CFNUL, E.N. 10, Sacavem 2686-953 (Portugal); Alves, E., E-mail: ealves@itn.pt [Instituto Tecnologico e Nuclear and CFNUL, E.N. 10, Sacavem 2686-953 (Portugal); Munnik, F. [Helmholtz-Zentrum Dresden-Rossendorf (Germany)

2012-02-15

Photocatalytic properties of TiO{sub 2} are expected to play an important role on emerging technologies based on OH radicals to destroy harmful nonbiodegradable organic and inorganic contaminants in water. The drawback is the wide band gap of TiO{sub 2} (3.2 eV) limiting its use to the UV part of electromagnetic spectrum under sunlight. Therefore, modifications of TiO{sub 2} are needed to tune the gap in order to allow an efficient use of the entire solar spectrum. One possibility is N-doping of TiO{sub 2} to make the photocatalytic activity possible under visible light and more suitable for water treatment. In our study nitrogen-doped TiO{sub 2} (TiO{sub 2-x}N{sub x}) films were deposited by DC-reactive magnetron sputtering using a dual-magnetron co-deposition apparatus on unheated glass and silicon substrates using a pure titanium target. The depth profile of nitrogen was measured with heavy ion elastic recoil detection analysis combined with Rutherford backscattering spectrometry (RBS) and correlated with the optical and structural properties obtained by UV-VIS spectroscopy and X-ray diffraction (XRD).

The Role of SiO2 Gas in the Operation of Anti-Corrosion Coating Produced by PVD

Directory of Open Access Journals (Sweden)

Meysam Zarchi

2015-09-01

Full Text Available This study examined theSiO2 gas present in the coatings used in corrosion industry.These layers have been created by physical vapor deposition (PVD, with an appropriate performance. Sublimation of SiO2is used to protect PVD aluminum flakes from water corrosionand to generate highly porous SiO2 flakes with holes in the nanometer range. SiOx/Al/SiOx sandwiches were made as well as Ag loaded porous SiO2 as antimicrobial filler.

Methods of Phase and Power Control in Magnetron Transmitters for Superconducting Accelerators

Energy Technology Data Exchange (ETDEWEB)

Kazadevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Neubauer, M. [MUONS Inc., Batavia; Lebedev, V. [Fermilab; Schappert, W. [Fermilab; Yakovlev, V. [Fermilab

2017-05-01

Various methods of phase and power control in magnetron RF sources of superconducting accelerators intended for ADS-class projects were recently developed and studied with conventional 2.45 GHz, 1 kW, CW magnetrons operating in pulsed and CW regimes. Magnetron transmitters excited by a resonant (injection-locking) phasemodulated signal can provide phase and power control with the rates required for precise stabilization of phase and amplitude of the accelerating field in Superconducting RF (SRF) cavities of the intensity-frontier accelerators. An innovative technique that can significantly increase the magnetron transmitter efficiency at the widerange power control required for superconducting accelerators was developed and verified with the 2.45 GHz magnetrons operating in CW and pulsed regimes. High efficiency magnetron transmitters of this type can significantly reduce the capital and operation costs of the ADSclass accelerator projects.

Phase Grouping of Larmor Electrons by a Synchronous Wave in Controlled Magnetrons

Energy Technology Data Exchange (ETDEWEB)

Kazakevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Lebedev, V. [Fermilab; Yakovlev, V. [Fermilab

2018-04-01

A simplified analytical model based on the charge drift approximation has been developed. It considers the resonant interaction of the synchronous wave with the flow of Larmor electrons in a magnetron. The model predicts stable coherent generation of the tube above and below the threshold of self-excitation. This occurs if the magnetron is driven by a sufficient resonant injected signal (up to -10 dB). The model substantiates precise stability, high efficiency and low noise at the range of the magnetron power control over 10 dB by variation of the magnetron current. The model and the verifying experiments with 2.45 GHz, 1 kW magnetrons are discussed.

Geometrical Aspects of a Hollow-cathode Magnetron (HCM)

International Nuclear Information System (INIS)

Cohen, Samuel A.; Wang, Zhehui

1998-01-01

A hollow-cathode magnetron (HCM), built by surrounding a planar sputtering-magnetron cathode with a hollow-cathode structure (HCS), is operable at substantially lower pressures than its planar-magnetron counterpart. We have studied the dependence of magnetron operational parameters on the inner diameter D and length L of a cylindrical HCS. Only when L is greater than L sub zero, a critical length, is the HCM operable in the new low-pressure regime. The critical length varies with HCS inner diameter D. Explanations of the lower operational pressure regime, critical length, and plasma shape are proposed and compared with a one-dimension diffusion model for energetic or primary electron transport. At pressures above 1 mTorr, an electron-impact ionization model with Bohm diffusion at a temperature equivalent to one-half the primary electron energy and with an ambipolar constraint can explain the ion-electron pair creation required to sustain the discharge. The critical length L sub zero is determined by the magnetization length of the primary electrons

A novel injection-locked amplitude-modulated magnetron at 1497 MHz

Energy Technology Data Exchange (ETDEWEB)

Neubauer, Michael [Muons Inc., Batavia, IL (United States); Wang, Haipeng [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)

2015-12-15

Thomas Jefferson National Accelerator Facility (JLab) uses low efficiency klystrons in the CEBAF machine. In the older portion they operate at 30% efficiency with a tube mean time between failure (MTBF) of five to six years. A highly efficient source (>55-60%) must provide a high degree of backwards compatibility, both in size and voltage requirements, to replace the klystron presently used at JLab, while providing energy savings. Muons, Inc. is developing a highly reliable, highly efficient RF source based upon a novel injection-locked amplitude modulated (AM) magnetron with a lower total cost of ownership, >80% efficiency, and MTBF of six to seven years. The design of the RF source is based upon a single injection-locked magnetron system at 8 kW capable of operating up to 13 kW, using the magnetron magnetic field to achieve the AM required for backwards compatibility to compensate for microphonics and beam loads. A novel injection-locked 1497 MHz 8 kW AM magnetron with a trim magnetic coil was designed and its operation numerically simulated during the Phase I project. The low-level RF system to control the trim field and magnetron anode voltage was designed and modeled for operation at the modulation frequencies of the microphonics. A plan for constructing a prototype magnetron and control system was developed.

Ring magnetron ionizer

International Nuclear Information System (INIS)

Alessi, J.G.

1986-01-01

A ring magnetron D - charge exchange ionizer has been built and tested. An H - current of 500 μA was extracted with an estimated H 0 density in the ionizer of 10 12 cm -3 . This exceeds the performance of ionizers presently in use on polarized H - sources. The ionizer will soon be tested with a polarized atomic beam

DEVICE FOR INVESTIGATION OF MAGNETRON AND PULSED-LASER PLASMA

Directory of Open Access Journals (Sweden)

A. P. Burmakov

2012-01-01

Full Text Available Various modifications of complex pulsed laser and magnetron deposition thin-film structures unit are presented. They include joint and separate variants of layer deposition. Unit realizes the plasma parameters control and enhances the possibility of laser-plasma and magnetron methods of coatings deposition.

Research and Development for an Alternative RF Source Using Magnetrons in CEBAF

Science.gov (United States)

Jacobs, Andrew

2016-09-01

At Jefferson Lab, klystrons are currently used as a radiofrequency (RF) power source for the 1497 MHz Continuous Electron Beam Accelerator Facility (CEBAF) Continuous Wave (CW) system. A drop-in replacement for the klystrons in the form of a system of magnetrons is being developed. The klystron DC-RF efficiency at CEBAF is 35-51% while the estimated magnetron efficiency is 80-90%. Thus, the introduction of magnetrons to CEBAF will have enormous benefits in terms of electrical power saving. The primary focus of this project was to characterize a magnetron's frequency pushing and pulling curves at 2.45 GHz with stub tuner and anode current adjustments so that a Low Level RF controller for a new 1.497 GHz magnetron can be built. A Virtual Instrument was created in LabVIEW, and data was taken. The resulting data allowed for the creation of many constant lines of frequency and output power. Additionally, the results provided a characterization of magnetron oven temperature drift over the operation time and the relationship between anode current and frequency. Using these results, the control model of different variables and their feedback or feedforward that affect the frequency pushing and pulling of the magnetron is better developed. Department of Energy, Science Undergraduate Laboratory Internships, and Jefferson Lab.

Crack resistance of pvd coatings : Influence of surface treatment prior to deposition

NARCIS (Netherlands)

Zoestbergen, E; de Hosson, J.T.M.

The crack resistance of three different PVD coatings, TiN, Ti(C,N), and a multilayer system of alternating TiN and TiAlN, have been investigated. The three coating systems were deposited onto substrates with a different surface roughness to study the influence of this pretreatment on the crack

Overview of PVD wear resistant coatings

International Nuclear Information System (INIS)

Teeter, F.J.

1999-01-01

The combined functionality of wear-resistant and low-friction multilayer coatings has widened application possibilities for a new generation of coated tools. For the first time tool wear mechanisms are comprehensively addressed both at the cutting edge and contact areas away from the edge where chip evacuation is facilitated. Since its recent market introduction a combined TiA1N and WC/C PVD coating has been proven to increase cutting performance in various metal cutting operations, notably drilling and tapping of steels and aluminum alloys. Significant improvements have been obtained under dry as well as with coolant conditions. The results of laboratory metal cutting tests and field trials to date will be described. Correlations between chip formation / wear mechanisms and coating properties are given to explain the effectiveness of this coating. (author)

Wear of Shaped Surfaces of PVD Coated Dies for Clinching

Directory of Open Access Journals (Sweden)

Miroslav Džupon

2017-11-01

Full Text Available A clinching method that uses a simple toolset consisting of a punch and a die, is utilized for joining lightweight materials. This paper is aimed at investigating the wear of the die cavity of a clinching tool. A clinching tool with a specially shaped cavity was used for joining thin hot-dip galvanized steel sheets. Various types of physical vapour deposition (PVD coatings such as ZrN, CrN and TiCN were deposited on the shaped surface of the die using Lateral Rotating Arc-Cathodes technology. Hot-dip galvanized steel sheets were used for testing the clinching tool. The material properties of PVD coatings that were deposited on the shaped part of the clinching die were evaluated. Finite Element Analysis was used to localize the area of the shaped part of the die and the part of surface area of the cylindrical die cavity of ϕ 5.0 mm, in which high contact pressure values were predicted. The prediction of the start of the wear cycle was verified experimentally by the clinching of 300 samples of hot-dip galvanized steel sheets. Unlike the CrN and ZrN coatings, the TiCN coating remained intact on the entire surface of the die.

Magnetron injection gun scaling

International Nuclear Information System (INIS)

Lawson, W.

1988-01-01

Existing analytic design equations for magnetron injection guns (MIG's) are approximated to obtain a set of scaling laws. The constraints are chosen to examine the maximum peak power capabilities of MIG's. The scaling laws are compared with exact solutions of the design equations and are supported by MIG simulations

Life test on indigenous s-band pulsed magnetron

International Nuclear Information System (INIS)

Wanmode, Y.D.; Shrivastava, P.; Hannurkar, P.R.

1999-01-01

A 2 MW S-band pulsed magnetron has been developed under joint collaboration between CAT and CEERI. In this development effort several lab prototypes were evaluated on 2 MW microwave test facility developed at CAT. One magnetron is subjected to life test. The present paper describes the setup and procedures used for life test. Various observations and corrections made during the life tests are also described. Results of the tests are discussed. (author)

High-temperature resistant MeCrAlY+Al coatings obtained by ARC-PVD method on Ni Base superalloys

International Nuclear Information System (INIS)

Swadzba, L.; Maciejny, A.; Mendala, B.; Supernak, W.

1999-01-01

Investigations of obtaining high temperature coatings on the Ni base superalloys by the ARC-PVD method, using exothermic reaction processes between Ni and Al with NiAl intermetallic formation are presented in the article. By the diffusion heating at 1050 o C NiAl high temperature diffusion coating containing 21% at. Al and 50 μm thick was obtained. In the next stage coatings with more complex chemical composition NiCoCrAlY were formed. The two targets were applied for formation of complex NiCoCrAlY coatings. The good consistence between the chemical composition of the targets and the coatings and an uniform distribution of elements in the coatings were shown. Then the surface was covered with aluminium also by the ARC-PVD method. In the vacuum chamber of the equipment a synthesis reaction between NiCoCrAlY and Al with the formation NiAl intermetallics of high Co, Cr, Y content was initiated by the changes in process parameters. The final heat treatment of coatings was conducted in the air and vacuum at 1050 o C. The strong segregation of yttrium in to the oxide scale in the specimens heated in the air was shown. It was possible to obtain NiAl intermetallic phase coatings modified by Co, Cr and Y by the ARC-PVD method. An example of the application of this method for the aircraft engine turbine blades was presented. Method of ARC-PVD gives the possibility chemical composition and high resistance to oxidizing and hot corrosion. (author)

Very low pressure high power impulse triggered magnetron sputtering

Science.gov (United States)

Anders, Andre; Andersson, Joakim

2013-10-29

A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.

Science.gov (United States)

Teixeira, V; Soares, P; Martins, A J; Carneiro, J; Cerqueira, F

2009-07-01

Carbon based films can combine the properties of solid lubricating graphite structure and hard diamond crystal structure, i.e., high hardness, chemical inertness, high thermal conductivity and optical transparency without the crystalline structure of diamond. Issues of fundamental importance associated with nanocarbon coatings are reducing stress, improving adhesion and compatibility with substrates. In this work new nanocomposite coatings with improved toughness based in nanocrystalline phases of metals and ceramics embedded in amorphous carbon matrix are being developed within the frame of a research project: nc-MeNxCy/a-C(Me) with Me = Mo, Si, Al, Ti, etc. Carbide forming metal/carbon (Me/C) composite films with Me = Mo, W or Ti possess appropriate properties to overcome the limitation of pure DLC films. These novel coating architectures will be adopted with the objective to decrease residual stress, improve adherence and fracture toughness, obtain low friction coefficient and high wear-resistance. Nanocomposite DLC's films were deposited by hybrid technique using a PVD-Physically Vapor Deposition (magnetron sputtering) and Plasma Enhanced Chemical Vapor Deposition (PECVD), by the use of CH4 gas. The parameters varied were: deposition time, substrate temperature (180 degrees C) and dopant (Si + Mo) of the amorphous carbon matrix. All the depositions were made on silicon wafers and steel substrates precoated with a silicon inter-layer. The characterisation of the film's physico-mechanical properties will be presented in order to understand the influence of the deposition parameters and metal content used within the a-C matrix in the thin film properties. Film microstructure and film hybridization state was characterized by Raman Spectroscopy. In order to characterize morphology SEM and AFM will be used. Film composition was measured by Energy-Dispersive X-ray analysis (EDS) and by X-ray photoelectron spectroscopy (XPS). The contact angle for the produced DLC's on

Partial sulfonation of PVdF-co-HFP: A preliminary study and characterization for application in direct methanol fuel cell

International Nuclear Information System (INIS)

Das, Suparna; Kumar, Piyush; Dutta, Kingshuk; Kundu, Patit Paban

2014-01-01

Highlights: • Synthesis of sulfonated PVdF-co-HFP by reacting with chlorosulfonic acid. • Maximum degree of sulfonation and best properties were obtained for 7 h reaction. • A maximum water uptake value of 20% was obtained. • A maximum IEC value of 0.42 meq g −1 was obtained. • A methanol permeability of 2.44 × 10 −7 cm 2 s −1 was obtained. - Abstract: Sulfonation of PVdF-co-HFP was conducted by treating the copolymer with chlorosulfonic acid. The efficiency of this sulfonated copolymer towards application as a polymer electrolyte membrane in direct methanol fuel cell (DMFC) was evaluated. For this purpose, we determined the thermal stability, water uptake, ion exchange capacity (IEC), methanol crossover, and proton conductivity of the prepared membranes as functions of duration and degree of sulfonation. The characteristic aromatic peaks obtained in the FT-IR spectra confirmed the successful sulfonation of PVdF-co-HFP. The effect of sulfonation on the semi-crystalline nature of pure PVdF-co-HFP was determined from XRD analysis. Water uptake results indicated that a sulfonation time of 7 h produced maximum water uptake value of about 20%, with a corresponding IEC and proton conductivity values of about 0.42 meq g −1 and 0.00375 S cm −1 respectively. The maximum current density was recorded to be 30 mA cm −2 at 0.2 V potential

Fuzzy tungsten in a magnetron sputtering device

Energy Technology Data Exchange (ETDEWEB)

Petty, T.J., E-mail: tjpetty@liv.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom); Khan, A. [Pariser Building-G11, School of Mechanical, Aerospace and Civil Engineering, The University of Manchester, Manchester, M13 9PL (United Kingdom); Heil, T. [NiCaL, Block C Waterhouse Building, 1-3 Brownlow Street, Liverpool, L69 3GL (United Kingdom); Bradley, J.W., E-mail: j.w.bradley@liverpool.ac.uk [Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool, L69 3GJ (United Kingdom)

2016-11-15

Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10{sup 23}–3.0 × 10{sup 24} m{sup −2}, the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10{sup 24} m{sup −2}, and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ{sup 1/2} relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

Fuzzy tungsten in a magnetron sputtering device

International Nuclear Information System (INIS)

Petty, T.J.; Khan, A.; Heil, T.; Bradley, J.W.

2016-01-01

Helium ion induced tungsten nanostructure (tungsten fuzz) has been studied in a magnetron sputtering device. Three parameters were varied, the fluence from 3.4 × 10 23 –3.0 × 10 24  m −2 , the He ion energy from 25 to 70 eV, and the surface temperature from 900 to 1200 K. For each sample, SEM images were captured, and measurements of the fuzz layer thickness, surface roughness, reflectivity, and average structure widths are provided. A cross-over point from pre-fuzz to fully formed fuzz is found at 2.4 ± 0.4 × 10 24  m −2 , and a temperature of 1080 ± 60 K. No significant change was observed in the energy sweep. The fuzz is compared to low fluence fuzz created in the PISCES-A linear plasma device. Magnetron fuzz is less uniform than fuzz created by PISCES-A and with generally larger structure widths. The thicknesses of the magnetron samples follow the original Φ 1/2 relation as opposed to the incubation fluence fit. - Highlights: • Fuzz has been created in a magnetron sputtering device. • Three parameters for fuzz formation have been swept. • A cross-over from pre-fuzz to fully formed fuzz is seen. • Evidence for annealing out at lower temperatures than has been seen before. • Evidence to suggest that fuzz grown in discrete exposures is not consistent with fuzz grown in one long exposure.

Recent progress in thin film processing by magnetron sputtering with plasma diagnostics

International Nuclear Information System (INIS)

Han, Jeon G

2009-01-01

The precise control of the structure and related properties becomes crucial for sophisticated applications of thin films deposited by magnetron sputtering in emerging industries including the flat panel display, digital electronics and nano- and bio-industries. The film structure is closely related to the total energy delivered to the substrate surface for nucleation and growth during all kinds of thin film processes, including magnetron sputtering. Therefore, the energy delivered to the surface for nucleation and growth during magnetron sputtering should be measured and analysed by integrated diagnostics of the plasma parameters which are closely associated with the process parameters and other external process conditions. This paper reviews the background of thin film nucleation and growth, the status of magnetron sputtering technology and the progress of plasma diagnostics for plasma processing. The evolution of the microstructure during magnetron sputtering is then discussed with respect to the change in the process variables in terms of the plasma parameters along with empirical data of the integrated plasma diagnostics for various magnetron sputtering conditions with conventional dc, pulsed dc and high power pulsed dc sputtering modes. Among the major energy terms to be discussed are the temperature change in the top surface region and the energies of ions and neutral species. (topical review)

Influence of Magnetron Effect on Barium Hexaferrite Thin Layers

International Nuclear Information System (INIS)

Hassane, H.; Chatelon, J.P.; Rousseau, J.J; Siblini, A.; Kriga, A.

2011-01-01

In this paper, we study the effects of a magnet, located in the cathode, on barium hexaferrite thin films deposited by RF magnetron sputtering technique. During the process, these effects can modify thickness, roughness and stress of coatings. The characteristics of the deposited layers depend on the substrate position that is located opposite of magnetron cathode. In the m agnetron area , one can observe that the high stress can produce cracks or detachment of layers and the increasing of both depositing rate and surface roughness. After sputtering elaboration, barium hexaferrite films are in a compressive stress mode. But, after the post-deposition heat treatment these films are in a tensile stress mode. To improve the quality of BaM films, the subsrtate has to be set outside the magnetron area. (author)

NOVEL TECHNIQUE OF POWER CONTROL IN MAGNETRON TRANSMITTERS FOR INTENSE ACCELERATORS

Energy Technology Data Exchange (ETDEWEB)

Kazakevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Neubauer, M.; Lebedev, V. [Fermilab; Schappert, W. [Fermilab; Yakovlev, V. [Fermilab

2016-10-21

A novel concept of a high-power magnetron transmitter allowing dynamic phase and power control at the frequency of locking signal is proposed. The transmitter compensating parasitic phase and amplitude modulations inherent in Superconducting RF (SRF) cavities within closed feedback loops is intended for powering of the intensity-frontier superconducting accelerators. The con- cept uses magnetrons driven by a sufficient resonant (in- jection-locking) signal and fed by the voltage which can be below the threshold of self-excitation. This provides an extended range of power control in a single magnetron at highest efficiency minimizing the cost of RF power unit and the operation cost. Proof-of-principle of the proposed concept demonstrated in pulsed and CW regimes with 2.45 GHz, 1kW magnetrons is discussed here. A conceptual scheme of the high-power transmitter allowing the dynamic wide-band phase and y power controls is presented and discussed.

Nanoporous zinc oxide films prepared by magnetron sputtering

International Nuclear Information System (INIS)

Ghimpu, L.; Lupan, O.; Popescu, L.; Tiginyanu, I.M.

2011-01-01

In this paper we demonstrate an inexpensive approach for the fabrication of nanoporous zinc oxide films by using magnetron sputtering. Study of the structural properties proves the crystallographic perfection of porous nanostructures and the possibility of its controlling by adjusting the technological parameters in the growth process. The XRD pattern of nanoporous ZnO films exhibits high intensity of the peaks relative to the background signal which is indicative of the ZnO hexagonal phase and a good crystallinity of the samples grown by magnetron sputtering.

X-band Linac for a 6 MeV dual-head radiation therapy gantry

Energy Technology Data Exchange (ETDEWEB)

Lee, Seung Hyun; Shin, Seung-Wook; Lee, Jongchul; Kim, Hui-Su [WCU Department of Energy Science, Suwon 440-746 (Korea, Republic of); Lee, Byeong-No; Lee, Byung-Chul [Radiation Instrumentation Research Division, Korea Atomic Energy Research Institute, Jeongeup 56212 (Korea, Republic of); Park, Hyung-dal; Song, Ki-back [Radiation Technology eXcellence (RTX), Daejeon 305-500 (Korea, Republic of); Song, Ho-seung; Mun, Sangchul; Ha, Donghyup [School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Chai, Jong-Seo, E-mail: jschai@skku.edu [School of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

2017-04-21

We developed a design for a 6 MeV X-band linear accelerator for radiation therapy in a dual-head gantry layout. The dual-head gantry has two linacs that can be operated independently. Each X-band linac accelerates electron bunches using high-power RF and generates X-rays for radiation therapy. It requires a versatile RF system and pulse sequence to accomplish various radiation therapy procedures. The RF system consists of 9.3 GHz, 2 MW X-band magnetron and associated RF transmission components. A test linac was assembled and operated to characterize its RF performance without beam. This paper presents these results along with a description of the gantry linacs and their operational requirements.

An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources

Energy Technology Data Exchange (ETDEWEB)

Weichsel, T., E-mail: tim.weichsel@fep.fraunhofer.de; Hartung, U.; Kopte, T. [Fraunhofer Institute for Electron Beam and Plasma Technology, 01277 Dresden (Germany); Zschornack, G. [Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany); Kreller, M.; Silze, A. [DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)

2014-05-15

An inverted cylindrical sputter magnetron device has been developed. The magnetron is acting as a metal vapor supply for an electron cyclotron resonance (ECR) ion source. FEM simulation of magnetic flux density was used to ensure that there is no critical interaction between both magnetic fields of magnetron and ECR ion source. Spatially resolved double Langmuir probe and optical emission spectroscopy measurements show an increase in electron density by one order of magnitude from 1 × 10{sup 10} cm{sup −3} to 1 × 10{sup 11} cm{sup −3}, when the magnetron plasma is exposed to the magnetic mirror field of the ECR ion source. Electron density enhancement is also indicated by magnetron plasma emission photography with a CCD camera. Furthermore, photographs visualize the formation of a localized loss-cone - area, when the magnetron is operated at magnetic mirror field conditions. The inverted cylindrical magnetron supplies a metal atom load rate of R > 1 × 10{sup 18} atoms/s for aluminum, which meets the demand for the production of a milliampere Al{sup +} ion beam.

Depth-resolved X-ray residual stress analysis in PVD (Ti, Cr) N hard coatings

CERN Document Server

Genzel, C

2003-01-01

Physical vapour deposition (PVD) of thin hard coatings on TiN basis is usually performed at rather low temperatures (T sub D < 500 C) far from thermal equilibrium, which leads to high intrinsic residual stresses in the growing film. In contrast to the extrinsic thermal residual stresses which can easily be estimated from the difference of the coefficients of thermal expansion between the substrate and the coating, a theoretical prediction of the intrinsic residual stresses is difficult, because their amount as well as their distribution within the film depend in a very complex way on the deposition kinetics. By the example of strongly fibre-textured PVD (Ti, Cr)N coatings which have been prepared under defined variation of the deposition parameters in order to adjust the residual stress distribution within the coatings, the paper compares different X-ray diffraction techniques with respect to their applicability for detecting residual stresses which are non-uniform over the coating thickness. (orig.)

Reactive magnetron sputtering model at making Ti-TiOx coatings

International Nuclear Information System (INIS)

Luchkin, A G; Kashapov, N F

2014-01-01

Mathematical model of reactive magnetron sputtering for plant VU 700-D is described. Approximating curves for experimental current-voltage characteristic for two gas input schemas are shown. Choice of gas input schema influences on model parameters (mainly on pumping speed). Reactive magnetron sputtering model allows develop technology of Ti - TiO x coatings deposition without changing atmosphere and pressure in vacuum chamber

Substrate heating and cooling during magnetron sputtering of copper target

Energy Technology Data Exchange (ETDEWEB)

Shapovalov, Viktor I.; Komlev, Andrey E.; Bondarenko, Anastasia S., E-mail: stopnastia@gmail.com; Baykov, Pavel B.; Karzin, Vitaliy V.

2016-02-22

Heating and cooling processes of the substrate during the DC magnetron sputtering of the copper target were investigated. The sensitive element of a thermocouple was used as a substrate. It was found, that the heat outflow rate from the substrate is lower when the magnetron is turned off rather than when it is turned on. Furthermore, the heating rate, the ultimate temperature, and the heat outflow rate related to the deposition of copper atoms are directly proportional to the discharge current density. - Highlights: • New effect of heat outflow from substrate when magnetron is on was discovered. • This new effect is linear in terms of heat outflow rate to target current ratio. • Kinetic equation for heating process additively considers this effect.

Multilayered and composite PVD-CVD coatings in cemented carbides manufacture

International Nuclear Information System (INIS)

Glushkov, V.N.; Anikeev, A.I.; Anikin, V.N.; Vereshchaka, A.S.

2001-01-01

Carbide cutting tools with wear-resistant coatings deposited by CVD process are widely employed in mechanical engineering to ensure a substantially longer service life of tool systems. However, the relatively high temperature and long time of the process make the substrate decarburise and, as a result, the bend strength and performance characteristics of a tool decrease. The present study suggests the problem of deteriorated strength of CVD-coated carbide tools be solved by the development of a technology that combines arc-PVD and CVD processes to deposit multilayered coatings of titanium and aluminium compounds. (author)

Resistencia a la corrosión y desgaste de recubrinnientos deTiN obtenidos por PVD

Directory of Open Access Journals (Sweden)

Conde, A.

2005-12-01

Full Text Available Surface hardening techniques for metallic alloys are widely used to achieve layers of very high hardness and corrosion and wear resistance. In the present paper TiN coatings are obtained by PVD on a tool steel. The films are characterized by SEM, X-ray diffraction and XPS. Corrosion behaviour in NaCl solution showed the importance of the presence of defects on the PVD coating due to the different electrochemical behaviour of the steel base. Pin-on-disk measurements at approximately 40% RH against a corundum (Al₂O₃ ball showed a significant decrease in the wear rate compared with the results for the standard tool steel.

Los tratamientos de endurecimiento superficial de aleaciones metálicas se utilizan para lograr capas de muy elevada dureza, resistencia a la corrosión y desgaste. En este trabajo, se estudia el comportamiento de recubrimientos de TiN obtenidos mediante PVD sobre aceros de herramientas. Las capas obtenidas se caracterizan mediante microscopía electrónica de barrido, difracción de rayos X y XPS. Se analiza el comportamiento frente a la corrosión de las capas protectoras, así como la influencia del substrato en su comportamiento en soluciones de NaCl. Finalmente, se realizan ensayos de desgaste por deslizamiento en seco mediante la técnica de pin-on-disk, comprobándose la mayor resistencia de estas capas.

A Plasma Lens for Magnetron Sputtering

International Nuclear Information System (INIS)

Anders, Andre; Brown, Jeff

2010-01-01

A plasma lens, consisting of a solenoid and potential-defining ring electrodes, has been placed between a magnetron and substrates to be coated. Photography reveals qualitative information on excitation, ionization, and the transport of plasma to the substrate.

Metallic Conductive Nanowires Elaborated by PVD Metal Deposition on Suspended DNA Bundles.

Science.gov (United States)

Brun, Christophe; Elchinger, Pierre-Henri; Nonglaton, Guillaume; Tidiane-Diagne, Cheikh; Tiron, Raluca; Thuaire, Aurélie; Gasparutto, Didier; Baillin, Xavier

2017-09-01

Metallic conductive nanowires (NWs) with DNA bundle core are achieved, thanks to an original process relying on double-stranded DNA alignment and physical vapor deposition (PVD) metallization steps involving a silicon substrate. First, bundles of DNA are suspended with a repeatable process between 2 µm high parallel electrodes with separating gaps ranging from 800 nm to 2 µm. The process consists in the drop deposition of a DNA lambda-phage solution on the electrodes followed by a naturally evaporation step. The deposition process is controlled by the DNA concentration within the buffer solution, the drop volume, and the electrode hydrophobicity. The suspended bundles are finally metallized with various thicknesses of titanium and gold by a PVD e-beam evaporation process. The achieved NWs have a width ranging from a few nanometers up to 100 nm. The electrical behavior of the achieved 60 and 80 nm width metallic NWs is shown to be Ohmic and their intrinsic resistance is estimated according to different geometrical models of the NW section area. For the 80 nm width NWs, a resistance of about few ohms is established, opening exploration fields for applications in microelectronics. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Interfacial fatigue stress in PVD TiN coated tool steels under rolling contact fatigue conditions

NARCIS (Netherlands)

Carvalho, N.J.M.; Huis in 't Veld, A.J.; Hosson, J.T. de

1998-01-01

Titanium-nitrogen (TiN) films were Physical Vapour Deposited (PVD) on tool steel substrates with different hardness and surface roughness, in a Bai 640R unit using a triode ion plating (e-gun) with a high plasma density. The coated substrates were submitted to a rolling contact fatigue test

Interfacial fatigue stress in PVD TiN coated tool steels under rolling contact fatigue conditions

NARCIS (Netherlands)

Carvalho, N.J.M.; Huis in ’t Veld, A.J.; Hosson, J.Th. De

1998-01-01

Titanium–nitrogen (TiN) films were Physical Vapour Deposited (PVD) on tool steel substrates with different hardness and surface roughness, in a Bai 640R unit using a triode ion plating (e-gun) with a high plasma density. The coated substrates were submitted to a rolling contact fatigue test

Study the effect of ion-complex on the properties of composite gel polymer electrolyte based on Electrospun PVdF nanofibrous membrane

International Nuclear Information System (INIS)

Li, Weili; Xing, Yujin; Wu, Yuhui; Wang, Jiawei; Chen, Lizhuang; Yang, Gang; Tang, Benzhong

2015-01-01

In this paper, nanofibrous membranes based on poly(vinylidene fluoride) (PVdF) doped with ion-complex (SiO 2 -PAALi) were prepared by electrospinning technique and the corresponding composite gel-polymer electrolytes (CGPEs) were obtained after being activated in liquid electrolyte. The microstructure, physical and electrochemical performances of the nanofibrous membranes and the corresponding CGPEs were studied by various measurements such as Fourier Transform Infrared Spectroscopy(FTIR), Scanning Electron Microscope (SEM), Differential Scanning Calorimetry (DSC), Thermal Gravimetric Analysis (TGA), Stress-strain test, Linear Sweep Voltammetry (LSV), AC impedance measurement and Charge/discharge cycle test. As to the ion-complex doped nanofibrous membranes, PVdF can provide mechanical support with network structure composed of fully interconnection; while the ion-complexes are absorbed onto the surface of the PVdF nanofibers evenly instead of being aggregated. With the help of doped ion-complex, the prepared nanofibrous membranes present good liquid electrolyte absorbability, excellent mechanical performance, and high decomposition temperature. For the corresponding CGPEs, they possess high ionic conductivity, wide electrochemical window, and good charge/discharge cycle performance

Geometrical aspects of a hollow-cathode planar magnetron

International Nuclear Information System (INIS)

Wang, Z.; Cohen, S.A.

1999-01-01

A hollow-cathode planar magnetron (HCPM), built by surrounding a planar sputtering-magnetron cathode with a hollow-cathode structure (HCS) [Z. Wang and S. A. Cohen, J. Vac. Sci. Technol. A 17, 77 (1999)], is operable at substantially lower pressures than its planar-magnetron counterpart. HCPM operational parameters depend on the inner diameter D and length L of its cylindrical HCS. Only when L is greater than L 0 , a critical length, is the HCPM operable in the new low-pressure regime. The critical length varies with HCS inner diameter D. Explanations of the lower operational pressure regime, critical length, and plasma shape are proposed and compared with a one-dimension diffusion model for energetic electron transport. At pressures above 1 mTorr, Bohm diffusion (temperature congruent primary electron energy), with an ambipolar constraint, can explain the ion - electron pair creation required to sustain the discharge. At the lowest pressure, ∼0.3 mTorr, collision-limited diffusion creates fewer ion - electron pairs than required for steady state and therefore cannot explain the experimental data. The critical length L 0 is consistent with the magnetization length of the primary electrons. copyright 1999 American Institute of Physics

Cutting Performance of Low Stress Thick TiAlN PVD Coatings during Machining of Compacted Graphite Cast Iron (CGI

Directory of Open Access Journals (Sweden)

Kenji Yamamoto

2018-01-01

Full Text Available A new family of physical vapor deposited (PVD coatings is presented in this paper. These coatings are deposited by a superfine cathode (SFC using the arc method. They combine a smooth surface, high hardness, and low residual stresses. This allows the production of PVD coatings as thick as 15 µm. In some applications, in particular for machining of such hard to cut material as compacted graphite iron (CGI, such coatings have shown better tool life compared to the conventional PVD coatings that have a lower thickness in the range of up to 5 μm. Finite element modeling of the temperature/stress profiles was done for the SFC coatings to present the temperature/stress profiles during cutting. Comprehensive characterization of the coatings was performed using XRD, TEM, SEM/EDS studies, nano-hardness, nano-impact measurements, and residual stress measurements. Application of the coating with this set of characteristics reduces the intensity of buildup edge formation during turning of CGI, leading to longer tool life. Optimization of the TiAlN-based coatings composition (Ti/Al ratio, architecture (mono vs. multilayer, and thickness were performed. Application of the optimized coating resulted in a 40–60% improvement in the cutting tool life under finishing turning of CGI.

Magnetron with smooth anode. Statistical theory and ordered oscillations; Magnetron a anode lisse. Theorie statistique et oscillations ordonnees

Energy Technology Data Exchange (ETDEWEB)

Coste, J.

1961-03-15

We have to investigate the equilibrium regime that appears between a hot cathode and the electronic cloud that is confined around the cathode by a magnetic field parallel to its axis. The densities being high enough to involve the effect of space charge. The challenge of the magnetron theory is to face 2 issues: first the structure of the electronic cloud in a diode submitted to a magnetic field and secondly the oscillations that are likely to appear in this cloud. In this work we have made 2 attempts to clarify the situation, we have extended the classical theory of the static charge of space through a study of its oscillation modes on one hand and on the other hand we have tackled the issue of the structure of the electronic cloud with the tool of statistics. This document is divided into 2 chapters. In the first chapter we present a static study of the magnetron in which we take a statistical approach deliberately. We give answers to the issue of the thermodynamical equilibrium of the electronic cloud and we have found a mode very close to the Brillouin mode. The statistical approach has made us discuss the boundary conditions on the cathode, it means the coupling between the cathode and the electronic cloud. In the second chapter we present the theoretical study of the oscillations in a magnetron operating in the Brillouin mode. The resonances that appear in experimental data stay difficult to explain.

Arc-discharge and magnetron sputtering combined equipment for nanocomposite coating deposition

International Nuclear Information System (INIS)

Koval, N.N.; Borisov, D.P.; Savostikov, V.M.

2005-01-01

It is known that characteristics of nanocomposite coatings produced by reactive magnetron sputtering undergo an essential influence on the following parameters such as original component composition of targets being sputtered, as well as abundance ratio of such components in the coatings deposited, relative content of inert and reactionary gases in a gas mixture used and a value of operating pressure in a chamber, substrate temperature, and a value of substrate bias potential, determining energy of ionized atoms, ionized atoms flow density, i.e. ion current density on a substrate. The multifactor character of production process of nanocomposite coatings with certain physical and mechanical properties demands a purposeful and complex control on all above-mentioned parameters. To solve such a problem, an arc-discharge and magnetron sputtering combined equipment including a vacuum chamber of approximately ∼ 0.5 m 3 with a built-in low-pressure plasma generator made on the basis of non-self-sustained discharge with a thermal cathode and a planar magnetron combined with two sputtered targets has been created. Construction of such a complex set-up provides both an autonomous mode of operation and simultaneous operation of an arc plasma generator and magnetron sputtering system. Magnetron sputtering of either one or two targets simultaneously is provided as well. An arc plasma generator enables ions current density control on a substrate in a wide range due to discharge current varying from 1 to 100 A. Energy of ions is also being controlled in a wide range by a negative bias potential from 0 to 1000 V applied to a substrate. The wide control range of gas plasma density of a arc discharge of approximately 10 9 -10 11 cm -3 and high uniformity of its distribution over the total volume of an operating chamber (about 15% error with regard to the mean value) provides a purposeful and simultaneous control either of magnetron discharge characteristics (operating pressure of

Reinforced PEI/PVdF Multicore-Shell Structure Composite Membranes by Phase Prediction on a Ternary Solution

Directory of Open Access Journals (Sweden)

Jihye Chae

2018-04-01

Full Text Available To construct a polyetherimide (PEI-reinforced polyvinylidene fluoride (PVdF composite membrane with multicore-shell structure, a ternary solution was prepared and electrospun by single-nozzle electrospinning. A theoretical prediction was made for the feasibility of complete distinction of two phases. The diameters of the membrane fibers and the PEI multi-core fibrils varied with the PEI ratio and the spinning time, respectively. The tensile strength and modulus were improved to 48 MPa and 1.5 GPa, respectively. The shrinkage of the membrane was only 6.6% at 180 °C, at which temperature the commercial PE separator melted down. The reinforcement in mechanical and thermal properties is associated with multiple PEI nanofibrils oriented along the fiber axis. Indeed, the unique morphology of self-assembled multicore-shell fibers plays an important role in their properties. All in all, PEI/PVdF membranes are appropriate for a lithium-ion battery application due to their high mechanical strength, excellent thermal stability, and controllable textural properties.

Evaluation of interfacial mechanical properties under shear loading in EB-PVD TBCs by the pushout method

Energy Technology Data Exchange (ETDEWEB)

Kim, Sang-Seok [Research Center for Advanced Science and Technology, University of Tokyo, Tokyo 153-8904 (Japan); Liu Yufu [Research Center for Advanced Science and Technology, University of Tokyo, Tokyo 153-8904 (Japan); Kagawa, Yutaka [Research Center for Advanced Science and Technology, University of Tokyo, Tokyo 153-8904 (Japan)]. E-mail: kagawa@iis.u-tokyo.ac.jp

2007-06-15

A new simple pushout technique for evaluation of interfacial shear mechanical properties in thermal barrier coatings has been developed. The technique is similar to the pushout test of fiber-reinforced ceramics, except for the specimen shape and support method. The technique has been applied to evaluation of interfacial delamination toughness, {gamma} {sub i}, of the electron beam physical vapor deposition (EB-PVD) ZrO{sub 2} thermal barrier coating (TBC) system. The change of {gamma} {sub i} in the EB-PVD system with thermal exposure is measured and discussed in terms of microstructural change and delamination crack path. The measured delamination toughness varied from {gamma} {sub i} = 10 to 115 J/m{sup 2}. The delamination path and TGO growth were found to be closely related. The delamination toughness significantly decreases due to the formation and growth of a spinel phase in the TGO layer. The relation between delamination toughness and delamination behavior is discussed.

Small grain size zirconium-based coatings deposited by magnetron sputtering at low temperatures

Energy Technology Data Exchange (ETDEWEB)

Jimenez, O., E-mail: omar.jimenez.udg@gmail.com [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, AP 307, CP 45101 Zapopan, Jal (Mexico); Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom); Audronis, M.; Leyland, A. [Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom); Flores, M.; Rodriguez, E. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, AP 307, CP 45101 Zapopan, Jal (Mexico); Kanakis, K.; Matthews, A. [Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD (United Kingdom)

2015-09-30

Hard, partly amorphous, ZrTiB(N) coatings were deposited by Physical Vapour Deposition (PVD) onto (111) silicon wafers at low substrate temperatures of 85 and 110 °C using Closed Field Unbalanced Magnetron Sputtering. A segmented rectangular sputter target composed of three pieces (Zr/TiB{sub 2}/Zr) was used as the source of evaporation of coating components. Two different substrate biases (i.e. floating potential and − 50 V) and N{sub 2} reactive-gas flow rates of 2, 4 and 6 sccm were employed as the main deposition parameter variables. The chemical composition, structure, morphology and mechanical properties were investigated using a variety of analytical techniques such as Glow-Discharge Optical Emission Spectroscopy, cross-sectional Scanning Electron Microscopy (SEM), Glancing Angle X-ray Diffraction (GAXRD) and nanoindentation. With other parameters fixed, coating properties were found to be dependent on the substrate negative bias and nitrogen flow rate. Linear scan profiles and SEM imaging revealed that all coatings were smooth, dense and featureless (in fracture cross section) with no apparent columnar morphology or macro-defects. GAXRD structural analysis revealed that mostly metallic phases were formed for coatings containing no nitrogen, whereas a solid solution (Zr,Ti)N single phase nitride was found in most of the reactively deposited coatings — exhibiting a very small grain size due to nitrogen and boron grain refinement effects. Hardness values from as low as 8.6 GPa up to a maximum of 25.9 GPa are related mainly to solid solution strengthening effects. The measured elastic moduli correlated with the trends in hardness behaviour; values in the range of 120–200 GPa were observed depending on the selected deposition parameters. Also, high H/E values (> 0.1) were achieved with several of the coatings.

High-current magnetron discharge with magnetic insulation of anode

International Nuclear Information System (INIS)

Bizyukov, A.A.; Sereda, K.N.; Sleptsov, V.V.

2008-01-01

In magnetron discharge at currents higher then critical which magnitude is in the range of 15...30 A the transition from glow discharge in transverse magnetic field to arc discharge occurs. In the present time the problem of arc blowout is solved at the expense of pulse and HF power supply applying. In this paper the alternative method of limiting current of magnetron discharge increasing at the expense of increasing of discharge gap resistance by means of additional anode layer transverse magnetic field and arc current interruption by sectioning of current collector of anode surface is carrying out

Effects of synchrotron x-rays on PVD deposited and ion implanted α-Si

International Nuclear Information System (INIS)

Yu, K.M.; Wang, L.; Walukiewicz, W.; Muto, S.; McCormick, S.; Abelson, J.R.

1997-01-01

The authors have studied the effects of intense X-ray irradiation on the structure of amorphous Si films. The films were obtained by either physical vapor deposition or by implantation of high energy ions into crystalline Si. They were exposed to different total doses of synchrotron X-rays. From the EXAFS and EXELFS measurements they find that an exposure to X-rays increases the Si coordination number. Also in the PVD films a prolonged X-ray exposure enlarges, by about 2%, the Si-Si bond length. Raman spectroscopy shows that Si amorphized with high energy ions contains small residual amounts of crystalline material. Irradiation of such films with X-rays annihilates those crystallites resulting in homogeneously amorphous layer with a close to four-fold coordination of Si atoms. This rearrangement of the local structure has a pronounced effect on the crystallization process of the amorphous films. Thermal annealing of X-ray irradiated ion amorphized films leads to nearly defect free solid phase epitaxy at 500 C. Also they observe a delay in the onset of the crystallization process in X-ray irradiated PVD films. They associate this with a reduced concentration of nucleation centers in the x-ray treated materials

A study on the high velocity impact behavior of titanium alloy by PVD method

International Nuclear Information System (INIS)

Sohn, Se Won; Lee, Doo Sung; Hong, Sung Hee

2001-01-01

In order to investigate the fracture behaviors(penetration modes) and resistance to penetration during ballistic impact of titanium alloy laminates and nitrified titanium alloy laminates which were treated by PVD(Physical Vapor Deposition) method, ballistic tests were conducted. Evaporation, sputtering, and ion plating are three kinds of PVD method. In this research, ion plating was used to achieve higher surface hardness and surface hardness test were conducted using a micro Vicker's hardness tester. Resistance to penetration is determined by the protection ballistic limit(V 50 ), a statistical velocity with 50% probability for complete penetration. Fracture behaviors and ballistic tolerance, described by penetration modes, are respectfully observed at and above ballistic limit velocities, as a result of V 50 test and Projectile Through Plates(PTP) test methods. PTP tests were conducted with 0 .deg. obliquity at room temperature using 5.56mm ball projectile. V 50 tests with 0 .deg. obliquity at room temperature were conducted with projectiles that were able to achieve near or complete penetration during PTP tests. Surface hardness, resistance to penetration, and penetration modes of titanium alloy laminates are compared to those of nitrified titanium alloy laminates

Surface and interface analysis of PVD Al-O-N and {gamma}-Al{sub 2}O{sub 3} diffusion barriers

Energy Technology Data Exchange (ETDEWEB)

Cremer, R.; Witthaut, M.; Reichert, K.; Neuschuetz, D. [Technische Hochschule Aachen (Germany). Lehrstuhl fuer Metallurgie der Kernbrennstoffe und Theoretische Huettenkunde

1999-10-01

The suitability of PVD films of {gamma}-Al{sub 2}O{sub 3} and of ternary Al-O-N as diffusion barriers between a nickel based superalloy CMSX-4 and NiCoCrAlY for a possible application in gas turbines was investigated. Therefore, an Al{sub 2}O{sub 3} film and, alternatively, an Al-O-N film were deposited on CMSX-4 at 100 C substrate temperature by means of reactive magnetron sputtering ion plating (MSIP). After characterization of composition and structure of the films by X-ray photoelectron spectroscopy (XPS) and grazing incidence X-ray diffraction (XRD), a NiCoCrAlY coating was deposited onto the diffusion barriers and, for comparison, directly onto CMSX-4 by MSIP as well. The composites were annealed for 4 h at 1100 C under inert atmosphere. Wavelength dispersive X-ray (WDX) element mappings and line-scans of the cross-sectional cut served to evaluate the suitability of the films as diffusion barriers. After detachment of the coatings from the substrate, the phase stabilities of the two metastable phases {gamma}-Al{sub 2}O{sub 3} and Al-O-N were determined by means of grazing incidence XRD. Without a diffusion barrier, enhanced interdiffusion was observed. Analyses of the composite with the {gamma}-Al{sub 2}O{sub 3} interlayer revealed diffusion of Ti and Ta from the substrate into the NiCoCrAlY coating. No interdiffusion of Ni, Ti, Ta, and Cr could be detected in case of the ternary Al-O-N film. Whereas the ternary Al-O-N film remained in the as-deposited X-ray amorphous structure after annealing, a phase change from the {gamma} to the {alpha} modification could be observed in case of the Al{sub 2}O{sub 3} film, presumably responsible for its lower efficiency as a diffusion barrier. (orig.)

Flexible free-standing TiO2/graphene/PVdF films as anode materials for lithium-ion batteries

International Nuclear Information System (INIS)

Ren, H.M.; Ding, Y.H.; Chang, F.H.; He, X.; Feng, J.Q.; Wang, C.F.; Jiang, Y.; Zhang, P.

2012-01-01

Highlights: ► Flexible TiO 2 /graphene electrode was prepared by a solvent evaporation technique. ► PVdF was used as substance to support the TiO 2 /graphene active materials. ► The flexible films can be employed as anode materials for Li-ion battery. - Abstract: Graphene composites were prepared by hydrothermal method using titanium dioxide (TiO 2 ) adsorbed graphene oxide (GO) sheets as precursors. Free-standing hybrid films for lithium-ion batteries were prepared by adding TiO 2 /graphene composites to the polyvinylidene fluoride (PVdF)/N-methyl-2-pyrrolidone (NMP) solution, followed by a solvent evaporation technique. These films were characterized by atomic force microscopy (AFM), X-ray diffraction (XRD), scanning electron microscopy (SEM) and various electrochemical techniques. Flexible films show an excellent cycling performance, which was attributed to the interconnected graphene conducting network, which depressed the increasing of electric resistance during the cycling.

Commissioning of indigenous microwave test facility for development and pilot production of 2 MW S-band magnetrons

International Nuclear Information System (INIS)

Shrivastava, Purushottam; Wanmode, Y.D.; Hannurkar, P.R.; Prasad, Sharda

2005-01-01

To have self reliance in the field of microwave devices and to have consistent supply of pulsed magnetrons for the Indian accelerator programme. CAT initiated development of 2 MW S-Band pulsed magnetrons in collaboration with CEERI, Pilani. The design, development and testing of the microwave test facilities for ageing. conditioning and performance testing of Indian magnetrons, was successfully done by CAT indigenously. After the rigorous testing. the test facility was shifted, installed and commissioned at CEERI, Pilani by CAT. Over a period of 10 years, nine prototypes were aged and tested, two magnetrons were life tested and five magnetrons under production programme have been successfully conditioned and tested. Testing of more numbers is underway. The system details. commissioning aspects are discussed, results are shown. (author)

Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

DEFF Research Database (Denmark)

Stamate, Eugen; Crovetto, Andrea; Sanna, Simone

2016-01-01

Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the f......Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of understanding the role of negative ions of oxygen during the film growth and improving the uniformity...

Prediction of the properties of PVD/CVD coatings with the use of FEM analysis

International Nuclear Information System (INIS)

Śliwa, Agata; Mikuła, Jarosław; Gołombek, Klaudiusz; Tański, Tomasz; Kwaśny, Waldemar; Bonek, Mirosław; Brytan, Zbigniew

2016-01-01

Highlights: • Prediction of the properties of PVD/CVD coatings with the use of (FEM) analysis. • Stress distribution in multilayer Ti/Ti(C,N)/CrN, Ti/Ti(C,N)/(Ti,Al)N coatings. • The experimental values of stresses were determined on X-ray diffraction patterns. • An FEM model was established for the purpose of building a computer simulation. - Abstract: The aim of this paper is to present the results of the prediction of the properties of PVD/CVD coatings with the use of finite element method (FEM) analysis. The possibility of employing the FEM in the evaluation of stress distribution in multilayer Ti/Ti(C,N)/CrN, Ti/Ti(C,N)/(Ti,Al)N, Ti/(Ti,Si)N/(Ti,Si)N, and Ti/DLC/DLC coatings by taking into account their deposition conditions on magnesium alloys has been discussed in the paper. The difference in internal stresses in the zone between the coating and the substrate is caused by, first of all, the difference between the mechanical and thermal properties of the substrate and the coating, and also by the structural changes that occur in these materials during the fabrication process, especially during the cooling process following PVD and CVD treatment. The experimental values of stresses were determined based on X-ray diffraction patterns that correspond to the modelled values, which in turn can be used to confirm the correctness of the accepted mathematical model for testing the problem. An FEM model was established for the purpose of building a computer simulation of the internal stresses in the coatings. The accuracy of the FEM model was verified by comparing the results of the computer simulation of the stresses with experimental results. A computer simulation of the stresses was carried out in the ANSYS environment using the FEM method. Structure observations, chemical composition measurements, and mechanical property characterisations of the investigated materials has been carried out to give a background for the discussion of the results that were

Prediction of the properties of PVD/CVD coatings with the use of FEM analysis

Energy Technology Data Exchange (ETDEWEB)

Śliwa, Agata; Mikuła, Jarosław; Gołombek, Klaudiusz; Tański, Tomasz; Kwaśny, Waldemar; Bonek, Mirosław, E-mail: miroslaw.bonek@polsl.pl; Brytan, Zbigniew

2016-12-01

Highlights: • Prediction of the properties of PVD/CVD coatings with the use of (FEM) analysis. • Stress distribution in multilayer Ti/Ti(C,N)/CrN, Ti/Ti(C,N)/(Ti,Al)N coatings. • The experimental values of stresses were determined on X-ray diffraction patterns. • An FEM model was established for the purpose of building a computer simulation. - Abstract: The aim of this paper is to present the results of the prediction of the properties of PVD/CVD coatings with the use of finite element method (FEM) analysis. The possibility of employing the FEM in the evaluation of stress distribution in multilayer Ti/Ti(C,N)/CrN, Ti/Ti(C,N)/(Ti,Al)N, Ti/(Ti,Si)N/(Ti,Si)N, and Ti/DLC/DLC coatings by taking into account their deposition conditions on magnesium alloys has been discussed in the paper. The difference in internal stresses in the zone between the coating and the substrate is caused by, first of all, the difference between the mechanical and thermal properties of the substrate and the coating, and also by the structural changes that occur in these materials during the fabrication process, especially during the cooling process following PVD and CVD treatment. The experimental values of stresses were determined based on X-ray diffraction patterns that correspond to the modelled values, which in turn can be used to confirm the correctness of the accepted mathematical model for testing the problem. An FEM model was established for the purpose of building a computer simulation of the internal stresses in the coatings. The accuracy of the FEM model was verified by comparing the results of the computer simulation of the stresses with experimental results. A computer simulation of the stresses was carried out in the ANSYS environment using the FEM method. Structure observations, chemical composition measurements, and mechanical property characterisations of the investigated materials has been carried out to give a background for the discussion of the results that were

Study of loading by beam of dual-resonator structure of linear electron accelerator

International Nuclear Information System (INIS)

Milovanov, O.S.; Smirnov, I.A.

1988-01-01

Loading by the beam of the accelerating structure of an Argus dual-resonator linear electron accelerator with a kinetic energy of ∼ 1 MeV and a pulsed beam current of up to 0.5 A is studied experimentally. It is shown that the conditions for stable single-frequency operation of the magnetron are disrupted and the acceleration process is cut off at certain electron-beam currents. Experimental curves of the maximum beam current and maximum electron efficiency of the Argus linear electron accelerator as functions of rf power are given

Optimization of hybrid polymer electrolytes with the effect of lithium salt concentration in PEO/PVdF-HFP blends

Energy Technology Data Exchange (ETDEWEB)

Pradeepa, P.; Edwin raj, S.; Sowmya, G.; Kalaiselvimary, J.; Ramesh Prabhu, M., E-mail: mkram83@gmail.com

2016-03-15

Highlights: • Polymer blends based on PVdF-HFP/PEO were prepared for Li-ion battery applications. • Structural and electrochemical studies were carried out on prepared electrolytes. • The electrolytes can be used as electrolyte in the possible device fabrications. - Abstract: Poly(ethylene oxide) (PEO) 6.25 wt%/poly(vinylidene fluoride-co-hexafluoropropylene) [P(VdF-HFP)] 18.75 wt% blend based electrolyte films containing different concentrations (2–10) wt% of lithium salt were prepared. The miscibility studies have been performed by using X-ray diffraction and Fourier transform infrared spectroscopy. The role of interaction between polymer hosts on conductivity is discussed using the results of a.c. impedance studies. A room temperature conductivity of 2.3912 × 10{sup −4} S cm{sup −1} has been obtained for PEO (6.25)–PVdF-HFP (18.75)–LiClO{sub 4} (8)–PC (67) polymer complex. The temperature dependence of the conductivity of polymer electrolyte seems to obey VTF relation. Electrochemical stability (3.3 V) was observed in the prepared polymer electrolyte. Reduction process and oxidation process of the prepared electrolyte system have also been evaluated by means of cyclic voltammetry. Thermogravimetric analysis results indicate thermal stability of PEO/PVdF-HFP lithium salt complexes. Roughness parameter of the sample having maximum ionic conductivity was studied by AFM. The morphology of the polymer complex is investigated by using SEM.

Electron relaxation properties of Ar magnetron plasmas

Science.gov (United States)

Xinjing, CAI; Xinxin, WANG; Xiaobing, ZOU

2018-03-01

An understanding of electron relaxation properties in plasmas is of importance in the application of magnetrons. An improved multi-term approximation of the Boltzmann equation is employed to study electron transport and relaxation properties in plasmas. Elastic, inelastic and nonconservative collisions between electrons and neutral particles are considered. The expressions for the transport coefficients are obtained using the expansion coefficients and the collision operator term. Numerical solutions of the matrix equations for the expansion coefficients are also investigated. Benchmark calculations of the Reid model are presented to demonstrate the accuracy of the improved multi-term approximation. It is shown that the two-term approximation is generally not accurate enough and the magnetic fields can reduce the anisotropy of the velocity distribution function. The electron relaxation properties of Ar plasmas in magnetrons for various magnetic fields are studied. It is demonstrated that the energy parameters change more slowly than the momentum parameters.

Advanced neutron and X-ray techniques for insights into the microstructure of EB-PVD thermal barrier coatings

Energy Technology Data Exchange (ETDEWEB)

Kulkarni, Anand [State University of New York, Stony Brook, NY 11794 (United States); Goland, Allen [State University of New York, Stony Brook, NY 11794 (United States); Herman, Herbert [State University of New York, Stony Brook, NY 11794 (United States)]. E-mail: hherman@ms.cc.sunysb.edu; Allen, Andrew J. [National Institute of Standards and Technology, Gaithersburg, MD 20899 (United States); Dobbins, Tabbetha [National Institute of Standards and Technology, Gaithersburg, MD 20899 (United States); DeCarlo, Francesco [Argonne National Laboratory, Argonne, IL 60439 (United States); Ilavsky, Jan [Argonne National Laboratory, Argonne, IL 60439 (United States); Long, Gabrielle G. [Argonne National Laboratory, Argonne, IL 60439 (United States); Fang, Stacy [Chromalloy Gas Turbine Corporation, Orangeburg, NY 10962 (United States); Lawton, Paul [Chromalloy Gas Turbine Corporation, Orangeburg, NY 10962 (United States)

2006-06-25

The ongoing quest to increase gas turbine efficiency and performance (increased thrust) provides a driving force for materials development. While improved engine design and usage of novel materials provide solutions for increased engine operating temperatures, and hence fuel efficiency, reliability issues remain. Thermal barrier coatings (TBCs), deposited onto turbine components using the electron-beam physical vapor deposition (EB-PVD) process, exhibit unique pore architectures capable of bridging the technological gap between insulation/life extension and prime reliance. This article explores the potential of advanced X-ray and neutron techniques for comprehension of an EB-PVD TBC coating microstructure. While conventional microscopy reveals a hierarchy of voids, complementary advanced techniques allow quantification of these voids in terms of component porosities, anisotropy, size and gradient through the coating thickness. In addition, the derived microstructural parameters obtained both further knowledge of the nature and architecture of the porosity, and help establish its influence on the resultant thermal and mechanical properties.

A Compact, Pi-Mode Extraction Scheme for the Axial B-Field Recirculating Planar Magnetron

Science.gov (United States)

2012-07-23

Figure 4). Thus, in a planar magnetron, the minimum phase velocity, vph , to stay above cutoff in the rectangular waveguide is ℎ = ...as magnetrons, electrons must be accelerated such that they are in synchronism with the phase velocity, vph , of the electromagnetic wave for an

Physics and phenomena in pulsed magnetrons: an overview

International Nuclear Information System (INIS)

Bradley, J W; Welzel, T

2009-01-01

This paper reviews the contribution made to the observation and understanding of the basic physical processes occurring in an important type of magnetized low-pressure plasma discharge, the pulsed magnetron. In industry, these plasma sources are operated typically in reactive mode where a cathode is sputtered in the presence of both chemically reactive and noble gases typically with the power modulated in the mid-frequency (5-350 kHz) range. In this review, we concentrate mostly, however, on physics-based studies carried out on magnetron systems operated in argon. This simplifies the physical-chemical processes occurring and makes interpretation of the observations somewhat easier. Since their first recorded use in 1993 there have been more than 300 peer-reviewed paper publications concerned with pulsed magnetrons, dealing wholly or in part with fundamental observations and basic studies. The fundamentals of these plasmas and the relationship between the plasma parameters and thin film quality regularly have whole sessions at international conferences devoted to them; however, since many different types of magnetron geometries have been used worldwide with different operating parameters the important results are often difficult to tease out. For example, we find the detailed observations of the plasma parameter (particle density and temperature) evolution from experiment to experiment are at best difficult to compare and at worst contradictory. We review in turn five major areas of studies which are addressed in the literature and try to draw out the major results. These areas are: fast electron generation, bulk plasma heating, short and long-term plasma parameter rise and decay rates, plasma potential modulation and transient phenomena. The influence of these phenomena on the ion energy and ion energy flux at the substrate is discussed. This review, although not exhaustive, will serve as a useful guide for more in-depth investigations using the referenced

MeCrAl coatings obtained by arc PVD and pack cementation processes on nickel base superalloys

International Nuclear Information System (INIS)

Swadzba, L.; Maciejny, A.; Formanek, B.; Mendala, B.

1997-01-01

The paper presents the results of researches on obtaining and structure of high temperature resistance coatings on superalloys. The coatings were deposited on nickel and nickel base superalloys in two stages. During the first stage, the NiCr and NiCrHf coatings were obtained by arc-PVD method. Basic technology, bias, arc current, rotation, parameters of deposition of NiCr and MeCrHf coatings were defined. The high efficiency of deposition of both single and two sources was observed. The targets were made by vacuum melting and machining. An influence of targets chemical composition on coating structure and chemical coatings composition was described. The second stage was made by pack cementation HTLA (high temperature low activity) on 1323 K chromoaluminizing process. These arc-PVD and diffusion (pack cementation) connected processes permitted to obtain MeCrAl and MeCrAlHf type of coatings. The morphology, structure and microchemical composition were characterized by scanning electron microscopy, X-ray microanalysis, energy dispersive X-ray spectroscopy and X-ray diffraction methods. (orig.)

Development and characterization of nano structured hard coatings for high performance tools by using PVD technique

International Nuclear Information System (INIS)

Irfan, M.; Alam, S.; Hassan, Z.; Iftikhar, F.; Khadim, S.

2006-01-01

No doubt hard coatings nave major applications in high performance cutting tools in order to improve tribological and mechanical properties of these tools since last years. The actual top development in this regard is the development of PVD based AlTiN coatings and their supplementation with nano. layers. In present these nano coatings are replaced by nano composites along with an additional development of Multilayer Nano structured coatings. This PVD based nano structured coating development optimized by process parameters, crystalline structure and deposition in multilayer. These coating are definitely produced by combination of ARC and Sputtering with filtration of arc droplets. It is studied that the properties like oxidation resistance, wear resistance and resistance against chemical reaction may be obtained by alloying additions of different elements. This paper presents different development stages and Process parameters for- producing high performance Nanostructure coatings and including adhesion test by using Kalomax system for determination of adhesion strength of these coatings and coating thickness measurements by using image analyzer system. Results and conclusions are showing the optimum values for better coatings for different applications. (author)

First demonstration and performance of an injection locked continuous wave magnetron to phase control a superconducting cavity

Directory of Open Access Journals (Sweden)

A. C. Dexter

2011-03-01

Full Text Available The applications of magnetrons to high power proton and cw electron linacs are discussed. An experiment is described where a 2.45 GHz magnetron has been used to drive a single cell superconducting cavity. With the magnetron injection locked, a modest phase control accuracy of 0.95° rms has been demonstrated. Factors limiting performance have been identified.

Characterization and Optimization of the Magnetron Directional Amplifier

National Research Council Canada - National Science Library

Hatfield, Michael

1999-01-01

.... A conventional microwave oven magnetron may be converted into a two-port amplifier capable of delivering over 30 dB of gain, while remaining phase-locked to the input signal over a wide frequency range...

Evaluation of Antibacterial Activity of Titanium Surface Modified by PVD/PACVD Process.

Science.gov (United States)

Ji, Min-Kyung; Lee, Min-Joo; Park, Sang-Won; Lee, Kwangmin; Yun, Kwi-Dug; Kim, Hyun-Seung; Oh, Gye-Jeong; Kim, Ji-Hyun; Lim, Hyun-Pil

2016-02-01

The aim of this study was to evaluate the response of Streptococcus mutans (S. mutans) via crystal violet staining assay on titanium surface modified by physical vapor deposition/plasma assisted chemical vapor deposition process. Specimens were divided into the following three groups: polished titanium (control group), titanium modified by DC magnetron sputtering (group TiN-Ti), and titanium modified by plasma nitriding (group N-Ti). Surface characteristics of specimens were observed by using nanosurface 3D optical profiler and field emission scanning electron microscope. Group TiN-Ti showed TiN layer of 1.2 microm in thickness. Group N-Ti was identified as plasma nitriding with X-ray photoelectron spectroscopy. Roughness average (Ra) of all specimens had values 0.05). Within the process condition of this study, modified titanium surfaces by DC magnetron sputtering and plasma nitriding did not influence the adhesion of S. mutans.

The Development and Application of the Magnetron,

Science.gov (United States)

1982-03-31

of *medicine. The power of the magnetron used is from several tens of watts to several hundred watts. Microwave physiotherapy has been used in...clinical practice for the fast cure of arthritis , rheumatism and the subsidence of swelling. Therapeutic results have been excellent. In recent years

Structure of MeCrAlY + AlSi coatings deposited by Arc-PVD method on CMSX4 single crystal alloy

International Nuclear Information System (INIS)

Swadzba, L.; Hetmanczyk, M.; Mendala, B.; Saunders, S.R.J.

2002-01-01

Investigations of depositing high temperature resistant coatings on the Ni base superalloys by Arc-PVD method using exothermic reaction processes between Ni and Al with NiAl intermetallic formation are presented in the article. By the diffusion heating at 1050 o C in vacuum, NiAl diffusion coating containing 21% at. Al and 50 μm thick were obtained. In the next stage coatings with more complex chemical composition - MeCrAlY were formed. The MeCrAlY coatings were made from two targets. Good correlation between the chemical composition of the targets and a uniform distribution of elements in the coatings was shown. Then the surface was also covered with aluminium by the Arc-PVD method . In the vacuum chamber of the equipment a synthesis reaction between NiCoCrAlY and Al with the formation of NiAl intermetallics of high Co, Cr, Y content was initiated. The final heat treatment of coatings was conducted in vacuum at 1323 K. Strong segregation of yttrium into the oxide scale in the specimens heated in the air was shown. It was possible to form NiAl and intermetallics phase coatings modified by Co, Cr and Y by the Arc-PVD method. The coatings were formed on a single crystal CMSX-4. The structure, morphology and phase composition of coatings was carried out. (author)

Improved Magnetron Stability and Reduced Noise in Efficient Transmitters for Superconducting Accelerators

Energy Technology Data Exchange (ETDEWEB)

Kazakevich, G. [MUONS Inc., Batavia; Johnson, R. [MUONS Inc., Batavia; Lebedev, V. [Fermilab; Yakovlev, V. [Fermilab

2018-04-01

State of the art high-current superconducting accelerators require efficient RF sources with a fast dynamic phase and power control. This allows for compensation of the phase and amplitude deviations of the accelerating voltage in the Superconducting RF (SRF) cavities caused by microphonics, etc. Efficient magnetron transmitters with fast phase and power control are attractive RF sources for this application. They are more cost effective than traditional RF sources such as klystrons, IOTs and solid-state amplifiers used with large scale accelerator projects. However, unlike traditional RF sources, controlled magnetrons operate as forced oscillators. Study of the impact of the controlling signal on magnetron stability, noise and efficiency is therefore important. This paper discusses experiments with 2.45 GHz, 1 kW tubes and verifies our analytical model which is based on the charge drift approximation.

Fiber damage during the consolidation of PVD Ti-6Al-4V coated NEXTEL 610 trademark alumina fibers

International Nuclear Information System (INIS)

Warren, J.; Elzey, D.M.; Wadley, H.N.G.

1995-01-01

Titanium matrix composites reinforced with sol-gel synthesized α-alumina fiber tows have attracted interest as a potentially low cost continuous fiber reinforced metal matrix composite system. The authors have conducted a detailed investigation of fiber damage during high temperature consolidation of PVD Ti-6Al-4V metallized sol-gel alumina fiber tows. Using both hot isostatic pressing and interrupted vacuum hot press consolidation cycles, the two principal mechanisms of fiber damage have been experimentally identified to be microbending/fracture and fiber matrix reaction. A time dependent micromechanics model incorporating the evolving geometry and mechanical properties of both the fibers and matrix has been formulated to simulate the fiber bending/failure mechanism in a representative unit cell and explore the effect of fiber strength loss due to reaction with the matrix. This model has been used to design a process cycle that minimizes damage by exploiting the enhanced superplastic deformation of the initially nanocrystalline PVD Ti-6Al-4V matrix

Solid-state pulse modulator for a 1.7-MW X-band magnetron

International Nuclear Information System (INIS)

Choi, Jaegu; Shin, Yongmoon; Choi, Youngwook; Kim, Kwanho

2014-01-01

Medical linear accelerators (LINAC) for cancer treatment require pulse modulators to generate high-power pulses with a fast rise time, flat top and short duration to drive high-power magnetrons. Solid-state pulse modulators (SSPM) for medical LINACs that use high power semiconductor switches with high repetition rates, high stability and long lifetimes have been introduced to replace conventional linear-type pulse generators that use gaseous discharge switches. In this paper, the performance of a developed SSPM, which mainly consists of a capacitor charger, an insulated-gate bipolar transistor (IGBT) - capacitor stack and a pulse transformer, is evaluated with a dummy load and an X-band magnetron load. A theoretical analysis of the pulse transformer, which is a critical element of the SSPM, is carried out. The output pulse has a fast rise time and low droop, such that the modulator can drive the X-band magnetron.

Structural characterisation of oxygen diffusion hardened alpha-tantalum PVD-coatings on titanium.

Science.gov (United States)

Hertl, C; Koll, L; Schmitz, T; Werner, E; Gbureck, U

2014-08-01

Titanium substrates were coated with tantalum layers of 5 μm thickness using physical vapour deposition (PVD). The tantalum layers showed a (110)-preferred orientation. The coated samples were hardened by oxygen diffusion. Using X-ray diffraction the crystallographic structure of the tantalum coatings was characterised, comparing untreated and diffusion hardened specimen conditions. Oxygen depth profiles were determined by glow discharge spectrometry. The hardening effect of the heat treatment was examined by Vickers microhardness testing. The increase of surface hardness caused by oxygen diffusion was at least 50%. Copyright © 2014 Elsevier B.V. All rights reserved.

Relation of Thermal Conductivity with Process Induced Anisotropic Void Systems in EB-PVD PYSZ Thermal Barrier Coatings

Energy Technology Data Exchange (ETDEWEB)

Renteria, A. Flores; Saruhan-Brings, B.; Ilavsky, J.

2008-03-03

Thermal barrier coatings (TBCs) deposited by Electron-beam physical deposition (EB-PVD) protect the turbine blades situated at the high pressure sector of the aircraft and stationary turbines. It is an important task to uphold low thermal conductivity in TBCs during long-term service at elevated temperatures. One of the most promising methods to fulfil this task is to optimize the properties of PYSZ-based TBC by tailoring its microstructure. Thermal conductivity of the EB-PVD produced PYSZ TBCs is influenced mainly by the size, shape, orientation and volume of the various types of porosity present in the coatings. These pores can be classified as open (inter-columnar and between feather arms gaps) and closed (intra-columnar pores). Since such pores are located within the three-dimensionally deposited columns and enclose large differences in their sizes, shapes, distribution and anisotropy, the accessibility for their characterization is very complex and requires the use of sophisticated methods. In this work, three different EB-PVD TBC microstructures were manufactured by varying the process parameters, yielding various characteristics of their pores. The corresponding thermal conductivities in as-coated state and after ageing at 11000C/1h and 100h were measured via Laser Flash Analysis Method (LFA). The pore characteristics and their individual effect on the thermal conductivity are analysed by USAXS which is supported by subsequent modelling and LFA methods, respectively. Evident differences in the thermal conductivity values of each microstructure were found in as-coated and aged conditions. In summary, broader columns introduce higher values in thermal conductivity. In general, thermal conductivity increases after ageing for all three investigated microstructures, although those with initial smaller pore surface area show smaller changes.

Relation of thermal conductivity with process induced anisotropic void system in EB-PVD PYSZ thermal barrier coatings.

Energy Technology Data Exchange (ETDEWEB)

Renteria, A. F.; Saruhan, B.; Ilavsky, J.; German Aerospace Center

2007-01-01

Thermal barrier coatings (TBCs) deposited by Electron-beam physical deposition (EB-PVD) protect the turbine blades situated at the high pressure sector of the aircraft and stationary turbines. It is an important task to uphold low thermal conductivity in TBCs during long-term service at elevated temperatures. One of the most promising methods to fulfil this task is to optimize the properties of PYSZ-based ,TBC by tailoring its microstructure. Thermal conductivity of the EB-PVD produced PYSZ TBCs is influenced mainly by the size, shape, orientation and volume of the various types of porosity present in the coatings. These pores can be classified as open (inter-columnar and between feather arms gaps) and closed (intra-columnar pores). Since such pores are located within the three-dimensionally deposited columns and enclose large differences in their sizes, shapes, distribution and anisotropy, the accessibility for their characterization is very complex and requires the use of sophisticated methods. In this work, three different EB-PVD TBC microstructures were manufactured by varying the process parameters, yielding various characteristics of their pores. The corresponding thermal conductivities in as-coated state and after ageing at 1100C/1h and 100h were measured via Laser Flash Analysis Method (LFA). The pore characteristics and their individual effect on the thermal conductivity are analysed by USAXS which is supported by subsequent modelling and LFA methods, respectively. Evident differences in the thermal conductivity values of each microstructure were found in as-coated and aged conditions. In summary, broader columns introduce higher values in thermal conductivity. In general, thermal conductivity increases after ageing for all three investigated microstructures, although those with initial smaller pore surface area show smaller changes.

Stress analysis and microstructure of PVD monolayer TiN and multilayer TiN/(Ti,Al)N coatings

NARCIS (Netherlands)

Carvalho, NJM; Zoestbergen, E; Kooi, BJ; De Hosson, JTM

2003-01-01

Two PVD titanium nitride based coatings; monolayer TiN and multilayer resulting from the stacking of TiN and (Ti,Al)N layers were evaluated with respect to their stress state and microstructure. The TiN was deposited by triode evaporation ion plating, whereas the TiN/(Ti,AI)N was deposited using a

Growth Mechanism for Low Temperature PVD Graphene Synthesis on Copper Using Amorphous Carbon

Science.gov (United States)

Narula, Udit; Tan, Cher Ming; Lai, Chao Sung

2017-03-01

Growth mechanism for synthesizing PVD based Graphene using Amorphous Carbon, catalyzed by Copper is investigated in this work. Different experiments with respect to Amorphous Carbon film thickness, annealing time and temperature are performed for the investigation. Copper film stress and its effect on hydrogen diffusion through the film grain boundaries are found to be the key factors for the growth mechanism, and supported by our Finite Element Modeling. Low temperature growth of Graphene is achieved and the proposed growth mechanism is found to remain valid at low temperatures.

Synthesis and electrochemical properties of Ti-doped DLC films by a hybrid PVD/PECVD process

Science.gov (United States)

Jo, Yeong Ju; Zhang, Teng Fei; Son, Myoung Jun; Kim, Kwang Ho

2018-03-01

Low electrical conductivity and poor adhesion to metallic substrates are the main drawbacks of diamond-like carbon (DLC) films when used in electrode applications. In this study, Ti-doped DLC films with various Ti contents were synthesized on metal Ti substrates by a hybrid PVD/PECVD process, where PECVD was used for deposition of DLC films and PVD was used for Ti doping. The effects of the Ti doping ratio on the microstructure, adhesion strength, and electrical and electrochemical properties of the DLC films were systematically investigated. An increase in the Ti content led to increased surface roughness and a higher sp2/sp3 ratio of the Ti-DLC films. Ti atoms existed as amorphous-phase Ti carbide when the Ti doping ratio was less than 2.8 at.%, while the nanocrystalline TiC phase was formed in DLC films when the Ti doping ratio was exceeded 4.0 at.%. The adhesion strength, electrical resistivity, electrochemical activity and reversibility of the DLC films were greatly improved by Ti doping. The influence of Ti doping ratio on the electrical and electrochemical properties of the DLC films were also investigated and the best performance was obtained at a Ti content of 2.8 at.%.

Plasma ``anti-assistance'' and ``self-assistance'' to high power impulse magnetron sputtering

Science.gov (United States)

Anders, André; Yushkov, Georgy Yu.

2009-04-01

A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contraproductive because it led to the extinction of the magnetron discharge. The effect can be explained by gas rarefaction. A better method of reducing the necessary gas pressure is operation at relatively high pulse repetition rates where the afterglow plasma of one pulse assists in the development of the next pulse. Here we show that this method, known from medium-frequency (MF) pulsed sputtering, is also very important at the much lower pulse repetition rates of HiPIMS. A minimum in the possible operational pressure is found in the frequency region between HiPIMS and MF pulsed sputtering.

Plasma 'anti-assistance' and 'self-assistance' to high power impulse magnetron sputtering

International Nuclear Information System (INIS)

Anders, Andre; Yushkov, Georgy Yu.

2009-01-01

A plasma assistance system was investigated with the goal to operate high power impulse magnetron sputtering (HiPIMS) at lower pressure than usual, thereby to enhance the utilization of the ballistic atoms and ions with high kinetic energy in the film growth process. Gas plasma flow from a constricted plasma source was aimed at the magnetron target. Contrary to initial expectations, such plasma assistance turned out to be contraproductive because it led to the extinction of the magnetron discharge. The effect can be explained by gas rarefaction. A better method of reducing the necessary gas pressure is operation at relatively high pulse repetition rates where the afterglow plasma of one pulse assists in the development of the next pulse. Here we show that this method, known from medium-frequency (MF) pulsed sputtering, is also very important at the much lower pulse repetition rates of HiPIMS. A minimum in the possible operational pressure is found in the frequency region between HiPIMS and MF pulsed sputtering

Simulation Study Using an Injection Phase-locked Magnetron as an Alternative Source for SRF Accelerators

Energy Technology Data Exchange (ETDEWEB)

Wang, Haipeng [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Plawski, Tomasz E. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Rimmer, Robert A. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States)

2015-09-01

As a drop-in replacement for the CEBAF CW klystron system, a 1497 MHz, CW-type high-efficiency magnetron using injection phase lock and amplitude variation is attractive. Amplitude control using magnetic field trimming and anode voltage modulation has been studied using analytical models and MATLAB/Simulink simulations. Since the 1497 MHz magnetron has not been built yet, previously measured characteristics of a 2.45GHz cooker magnetron are used as reference. The results of linear responses to the amplitude and phase control of a superconducting RF (SRF) cavity, and the expected overall benefit for the current CEBAF and future MEIC RF systems are presented in this paper.

Double Pulse LIBS of Titanium-Based PVD-Coatings with Submicron Resolution

Directory of Open Access Journals (Sweden)

K. Ermalitskaia

2016-01-01

Full Text Available The possibility for double pulse LIBS in the process of a direct layer-by-layer analysis of the titanium-based PVD-coatings on polished flat blank samples of steel and silicon and also of the TiAlN/TiN-coating on a milling cutter is considered. A method is proposed to control thickness of the radiation evaporated layer by defocusing the laser beam with respect to the surface, making it possible to attain the depth resolution of 0.1 μm. The Ti and Ti-Zr-coatings produced using the ion-assisted condensation method and subjected to streams of the nitrogen plasma in a magnetic-plasma compressor are studied.

Computer analysis, design and construction of the BNL Mk V magnetron

International Nuclear Information System (INIS)

McKenzie-Wilson, R.B.; Kovarik, V.J.

1981-01-01

As part of a program to develop a high energy neutral beam injector for fusion reactor applications, the BNL Neutral Beam Group is studying, among other options, a surface plasma source of the magnetron type. This source has been developed to the point at which a large compact model, known as the Mk V magnetron, has been designed and constructed. The source is designed to operate in the steady state mode and to produce 1-2A of H - (D - ) ions at 25 kV. Under these conditions, 18 KW of heat are removed from the source by the cooling system

Analysis of the environmental and nature impacts of 'Building Bridges'. Coalition VVD-PvdA, October 29, 2012. A quick scan; Analyse van de milieu- en natuureffecten van 'Bruggen slaan'. Regeerakkoord VVD-PvdA d.d. 29 oktober 2012. Een quick-scan

Energy Technology Data Exchange (ETDEWEB)

Dietz, F. (ed.)

2012-11-15

The coalition between the political parties VVD (liberals) and PvdA (socialists) connects the transition to a sustainable economy and green growth to strengthening the competitive capacity of the Dutch economy. The role of the Dutch government in the coalition aims at creating a framework and to provide facilities to realize the transition. In this memo the results of an analysis of the impacts of the coalition are given for the themes Energy and Climate, Nature, Transport and Traffic, and Green Growth [Dutch] Het Regeerakkoord VVD-PvdA koppelt de transitie naar een duurzame economie en groene groei aan het versterken van het concurrentievermogen van de Nederlandse economie. De rol van de rijksoverheid wordt in het regeerakkoord met name ingevuld als kaderstellend en faciliterend. De PBL-notitie analyseert de effecten van het regeringsakkoord voor de thema's Energie en Klimaat, Natuur, Verkeer en Vervoer, en Groene groei.

Reducing virulence of the human pathogen Burkholderia by altering the substrate specificity of the quorum-quenching acylase PvdQ

NARCIS (Netherlands)

Koch, Gudrun; Nadal-Jimenez, Pol; Reis, Carlos R.; Muntendam, Remco; Bokhove, Marcel; Melillo, Elena; Dijkstra, Bauke W.; Cool, Robbert H.; Quax, Wim J.

2014-01-01

The use of enzymes to interfere with quorum sensing represents an attractive strategy to fight bacterial infections. We used PvdQ, an effective quorum-quenching enzyme from Pseudomonas aeruginosa, as a template to generate an acylase able to effectively hydrolyze C8-HSL, the major communication

High performance a-IGZO thin-film transistors with mf-PVD SiO2 as an etch-stop-layer

NARCIS (Netherlands)

Nag, M.; Steudel, S.; Bhoolokam, A.; Chasin, A.; Rockele, M.; Myny, K.; Maas, J.; Fritz, T.; Trube, J.; Groeseneken, G.; Heremans, P.

2014-01-01

In this work, we report on high-performance bottom-gate top-contact (BGTC) amorphous-Indium-Gallium-Zinc-Oxide (a-IGZO) thin-film transistor (TFT) with SiO2 as an etch-stop-layer (ESL) deposited by medium frequency physical vapor deposition (mf-PVD). The TFTs show field-effect mobility (μFE) of

Magnetic field effects on coating deposition rate and surface morphology coatings using magnetron sputtering

International Nuclear Information System (INIS)

Yang, Yu-Sen; Huang, Wesley

2010-01-01

Chromium nitride coatings exhibit superior hardness, excellent wear and oxidation resistance, and are widely applied in the die and mold industries. The aim of this study was to investigate magnetic field effects on the deposition rate and surface morphology of chromium nitride coatings deposited by magnetron sputtering. Four types of magnetic field configurations, including the magnetron sputtering system, SNSN, SNNN, and intermediate magnetron modification, are discussed in this paper. SKD11 cold work die steel and a silicon (100) chip were used as substrates in the chromium nitride depositions. The process parameters, such as target current, substrate bias, and the distance between the substrate and target, are at fixed conditions, except for the magnetic arrangement type. The experimental results showed that the deposition rates of the four types of magnetic field configurations were 1.06, 1.38, 1.67 and 1.26 µm h −1 , respectively. In these cases, the SNNN type performs more than 58% faster than the unbalanced magnetron configuration does for the deposition rate. The surface morphology of chromium nitride films was also examined by SEM and is discussed in this paper

Polyester fabric coated with Ag/ZnO composite film by magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Yuan, Xiaohong, E-mail: yxhong1981_2004@126.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Faculty of Clothing and Design, Minjiang University, Fuzhou 350121, Fujian (China); Xu, Wenzheng, E-mail: xwz8199@126.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Huang, Fenglin, E-mail: windhuang325@163.com [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China); Chen, Dongsheng, E-mail: mjuchen@126.com [Faculty of Clothing and Design, Minjiang University, Fuzhou 350121, Fujian (China); Wei, Qufu, E-mail: qfwei@jiangnan.edu.cn [Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu (China)

2016-12-30

Highlights: • Ag/ZnO composite film was successfully deposited on polyester fabric by magnetron sputtering technique. • Ag film was easily oxidized into Ag{sub 2}O film in high vacuum oxygen environment. • The zinc film coated on the surface of Ag film before RF reactive sputtering could protect the silver film from oxidation. • Polyester fabric coated with Ag/ZnO composite film can obtained structural color. • The anti-ultraviolet and antistatic properties of polyester fabric coated with Ag/ZnO composite film all were good. - Abstract: Ag/ZnO composite film was successfully deposited on polyester fabric by using direct current (DC) magnetron sputtering and radio frequency (RF) magnetron reaction sputtering techniques with pure silver (Ag) and zinc (Zn) targets. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were used to examine the deposited film on the fabric. It was found that the zinc film coated on Ag film before RF reactive sputtering could protect the silver film from oxidation. Anti-ultraviolet property and antistatic property of the coated samples using different magnetron sputtering methods were also investigated. The experimental results showed that Ag film was oxidized into in Ag{sub 2}O film in high vacuum oxygen environment. The deposition of Zn film on the surface of the fabric coated with Ag film before RF reactive sputtering, could successfully obtained Ag/ZnO composite film, and also generated structural color on the polyester fabric.

SERS spectra of pyridine adsorbed on nickel film prepared by magnetron sputtering

Science.gov (United States)

Li, Daoyong; Ouyang, Yu; Chen, Li; Cao, Weiran; Shi, Shaohua

2011-02-01

As a repeating well and cheaper enhancement substrate, the nickel film was fabricated with magnetron sputtering coating instrument. Surface enhanced Raman spectra (SERS) of pyridine adsorbed on this nickel film are compared with the experimental values of gaseous pyridine, the theoretical value of pyridine solution listed in other literatures and our method is better than electro-chemical etching electrode method for large scale preparation. The enhancement factor of the nickel film is calculated and the result indicates that magnetron sputtering coating technology is feasible for obtaining good SERS active surface.

Operational experience with the BNL magnetron H- source

International Nuclear Information System (INIS)

Witkover, R.L.

1983-01-01

A magnetron H - source with a grooved cathode has been in operation at the BNL Linac for over 18 months. The source has run at 5 pps with a 600 μsec pulse width for periods as long as 5 months. Its development and performance will be discussed

Multi-sided metallization of textile fibres by using magnetron system with grounded cathode

Directory of Open Access Journals (Sweden)

Chodun Rafał

2017-10-01

Full Text Available The synthesis of coatings on textiles fibers enables functionalization of their properties e.g.: changing the reaction on IR radiation. In our experiment, a magnetron with a grounded cathode and positively biased anode was used as a source of plasma. A ring anode was positioned at 8 cm distance from the cathode. Samples of glass and cotton textile were placed at the plane of the anode. Ti and TiN coatings were deposited by sputtering of titanium target in Ar or Ar+ N2 atmosphere. SEM studies showed that, using the magnetron system described above, the textile fibers were covered by the 2 μm to 3 μm thick coatings. Unexpectedly, the coatings were deposited at both sides of the samples: the front side was exposed to glow discharge plasma and the backside was completely shaded from the plasma. IR optical investigation exhibited significant change in reflectance and transmittance of the coated textiles. The using of standard magnetron system (grounded anode and cathode at negative potential resulted in a coating deposition at the textile side exposed to the plasma action only. We believe that the multi-sided deposition of coatings observed during the process run with magnetron with grounded cathode is a result of an ambipolar diffusion mechanism in the anodic potential drop region.

Corrosion Resistance Behavior of Single-Layer Cathodic Arc PVD Nitride-Base Coatings in 1M HCl and 3.5 pct NaCl Solutions

Science.gov (United States)

Adesina, Akeem Yusuf; Gasem, Zuhair M.; Madhan Kumar, Arumugam

2017-04-01

The electrochemical behavior of single-layer TiN, CrN, CrAlN, and TiAlN coatings on 304 stainless steel substrate, deposited using state-of-the-art and industrial size cathodic arc PVD machine, were evaluated in 1M HCl and 3.5 pct NaCl solutions. The corrosion behavior of the blank and coated substrates was analyzed by electrochemical impedance spectroscopy (EIS), linear polarization resistance, and potentiodynamic polarization. Bond-coat layers of pure-Ti, pure-Cr, alloyed-CrAl, and alloyed-TiAl for TiN, CrN, CrAlN, and TiAlN coatings were, respectively, first deposited for improved coating adhesion before the actual coating. The average coating thickness was about 1.80 µm. Results showed that the corrosion potentials ( E corr) of the coated substrates were shifted to more noble values which indicated improvement of the coated substrate resistance to corrosion susceptibility. The corrosion current densities were lower for all coated substrates as compared to the blank substrate. Similarly, EIS parameters showed that these coatings possessed improved resistance to defects and pores in similar solution compared to the same nitride coatings developed by magnetron sputtering. The charge transfer resistance ( R ct) can be ranked in the following order: TiAlN > CrN > TiN > CrAlN in both media except in NaCl solution where R ct of TiN is lowest. While the pore resistance ( R po) followed the order: CrAlN > CrN > TiAlN > TiN in HCl solution and TiAlN > CrN > CrAlN > TiN in NaCl solution. It is found that TiAlN coating has the highest protective efficiencies of 79 and 99 pct in 1M HCl and 3.5 pct NaCl, respectively. SEM analysis of the corroded substrates in both media was also presented.

High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom)

2015-01-01

Cadmium Sulphide (CdS) is an important n-type semiconductor widely used as a window layer in thin film photovoltaics Copper Indium Selenide, Copper Indium Gallium (di)Selenide, Copper Zinc Tin Sulphide and Cadmium Telluride (CdTe). Cadmium Sulphide has been deposited using a number of techniques but these techniques can be slow (chemical bath deposition and Radio Frequency sputtering) or the uniformity and the control of thickness can be relatively difficult (close space sublimation). In this paper we report on the development of a process using pulsed Direct Current magnetron sputtering which allows nanometre control of thin film thickness using time only. The CdS thin films deposited in this process are highly uniform and smooth. They exhibit the preferred hexagonal structure at room temperature deposition and they have excellent optical properties. Importantly, the process is highly stable despite the use of a semi-insulating magnetron target. Moreover, the process is very fast. The deposition rate using 1.5 kW of power to a 6-inch circular magnetron was measured to be greater than 8 nm/s. This makes the process suitable for industrial deployment. - Highlights: • Pulsed DC magnetron sputtering of CdS • High deposition rate deposition • Uniform, pinhole free films.

High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering

International Nuclear Information System (INIS)

Lisco, F.; Kaminski, P.M.; Abbas, A.; Bowers, J.W.; Claudio, G.; Losurdo, M.; Walls, J.M.

2015-01-01

Cadmium Sulphide (CdS) is an important n-type semiconductor widely used as a window layer in thin film photovoltaics Copper Indium Selenide, Copper Indium Gallium (di)Selenide, Copper Zinc Tin Sulphide and Cadmium Telluride (CdTe). Cadmium Sulphide has been deposited using a number of techniques but these techniques can be slow (chemical bath deposition and Radio Frequency sputtering) or the uniformity and the control of thickness can be relatively difficult (close space sublimation). In this paper we report on the development of a process using pulsed Direct Current magnetron sputtering which allows nanometre control of thin film thickness using time only. The CdS thin films deposited in this process are highly uniform and smooth. They exhibit the preferred hexagonal structure at room temperature deposition and they have excellent optical properties. Importantly, the process is highly stable despite the use of a semi-insulating magnetron target. Moreover, the process is very fast. The deposition rate using 1.5 kW of power to a 6-inch circular magnetron was measured to be greater than 8 nm/s. This makes the process suitable for industrial deployment. - Highlights: • Pulsed DC magnetron sputtering of CdS • High deposition rate deposition • Uniform, pinhole free films

An apparatus for sequential pulsed plasma beam treatment in combination with Arc PVD deposition

International Nuclear Information System (INIS)

Stanislawski, J.; Werner, Z.; Piekoszewski, J.; Richter, E.

2002-01-01

A hybrid type of apparatus is described which enables one to form a thin multi-layer film on the surface of any kind of solid substrate. In one process, the surface is treated with a high intensity pulse plasma beam which introduces the chosen kind of atoms into the near-surface layer of the substrate. In the second process, following the first without breaking the vacuum, the coating is formed by arc PVD (physics vapour deposition) process. Two examples of coatings formed on metallic and ceramic substrates are presented. (author)

Development of Production PVD-AIN Buffer Layer System and Processes to Reduce Epitaxy Costs and Increase LED Efficiency

Energy Technology Data Exchange (ETDEWEB)

Cerio, Frank

2013-09-14

was analyzed and improvements implemented to the Veeco PVD-AlN prototype system to establish a specification and baseline PVD-AlN films on sapphire and in parallel the evaluation of PVD AlN on silicon substrates began. In Phase II of the project a Beta tool based on a scaled-up process module capable of depositing uniform films on batches of 4”or 6” diameter substrates in a production worthy operation was developed and qualified. In Phase III, the means to increase the throughput of the PVD-AlN system was evaluated and focused primarily on minimizing the impact of the substrate heating and cooling times that dominated the overall cycle time.

Investigation of vanadium and nitride alloys thin layers deposited by PVD

Directory of Open Access Journals (Sweden)

Nouveau C.

2012-06-01

Full Text Available In this work we present the technique of magnetron vapor deposition and the effect of several deposition parameters on the structural and morphological properties of prepared thin films. It was noted that the deposition time has an effect on the crystallinity, mechanical properties such as residual stress, roughness surface and the layer composition from target products. Studies were carried out on layers of vanadium (V and the nitride vanadium (VN.

TOPICAL REVIEW: Physics and phenomena in pulsed magnetrons: an overview

Science.gov (United States)

Bradley, J. W.; Welzel, T.

2009-05-01

This paper reviews the contribution made to the observation and understanding of the basic physical processes occurring in an important type of magnetized low-pressure plasma discharge, the pulsed magnetron. In industry, these plasma sources are operated typically in reactive mode where a cathode is sputtered in the presence of both chemically reactive and noble gases typically with the power modulated in the mid-frequency (5-350 kHz) range. In this review, we concentrate mostly, however, on physics-based studies carried out on magnetron systems operated in argon. This simplifies the physical-chemical processes occurring and makes interpretation of the observations somewhat easier. Since their first recorded use in 1993 there have been more than 300 peer-reviewed paper publications concerned with pulsed magnetrons, dealing wholly or in part with fundamental observations and basic studies. The fundamentals of these plasmas and the relationship between the plasma parameters and thin film quality regularly have whole sessions at international conferences devoted to them; however, since many different types of magnetron geometries have been used worldwide with different operating parameters the important results are often difficult to tease out. For example, we find the detailed observations of the plasma parameter (particle density and temperature) evolution from experiment to experiment are at best difficult to compare and at worst contradictory. We review in turn five major areas of studies which are addressed in the literature and try to draw out the major results. These areas are: fast electron generation, bulk plasma heating, short and long-term plasma parameter rise and decay rates, plasma potential modulation and transient phenomena. The influence of these phenomena on the ion energy and ion energy flux at the substrate is discussed. This review, although not exhaustive, will serve as a useful guide for more in-depth investigations using the referenced

Development of a Magnetron Resonance Frequency Auto Tuning System for Medical Xband [9300 MHz] RF Linear Accelerator

Energy Technology Data Exchange (ETDEWEB)

Cha, Sung Su; Lee, Byung Cheol [University of Science and Technology, Daejeon (Korea, Republic of); Kim, Yujong; Park, Hyung Dal; Lee, Byeong-No; Joo, Youngwoo; Cha, Hyungki; Lee, Soo Min; Song, Ki Baek [KAERI, Daejeon (Korea, Republic of); Lee, Seung Hyun [Sungkyunkwan University, Suwon (Korea, Republic of)

2015-05-15

The total components of the accelerator are the magnetron, electron gun, accelerating structure, a set of solenoid magnets, four sets of steering coils, a modulator, and a circulator. One of the accelerator components of the accelerating structure is made of oxygen-free high-conductivity copper (OFHC), and its volume is changed according to the ambient temperature. As the volume changes, the resonant frequency of the accelerating structure is changed. Accordingly, the resonance frequency is mismatched between the source of the magnetron and the accelerating structure. An automatic frequency tuning system is automatically matched with the resonant frequency of the magnetron and accelerating structure, which allows a high output power and reliable accelerator operation. An automatic frequency tuning system is composed of a step motor control part for correcting the frequency of the source and power measuring parts, i.e., the forward and reflected power between the magnetron and accelerating structure. In this paper, the design, fabrication, and RF power test of the automatic frequency tuning system for the X-band linac are presented. A frequency tuning system was developed to overcome an unstable accelerator operation owing to the frequency mismatch between the magnetron and accelerating structure. The frequency measurement accuracy is 100 kHz and 0.72 degree per pulse.

Antibacterial Functionalization of PVD Coatings on Ceramics

Directory of Open Access Journals (Sweden)

Javier Osés

2018-05-01

Full Text Available The application of surface treatments that incorporate silver or copper as antibacterial elements has become a common practice for a wide variety of medical devices and materials because of their effective activity against nosocomial infections. Ceramic tiles are choice materials for cladding the floors and walls of operation rooms and other hospital spaces. This study is focused on the deposition of biocide physical vapor deposition (PVD coatings on glazed ceramic tiles. The objective was to provide antibacterial activity to the surfaces without worsening their mechanical properties. Silver and copper-doped chromium nitride (CrN and titanium nitride (TiN coatings were deposited on samples of tiles. A complete characterization was carried out in order to determine the composition and structure of the coatings, as well as their topographical and mechanical properties. The distribution of Ag and Cu within the coating was analyzed using glow discharge optical emission spectrometry (GD-OES and field emission scanning electron microscope (FE-SEM. Roughness, microhardness, and scratch resistance were measured for all of the combinations of coatings and dopants, as well as their wettability. Finally, tests of antibacterial efficacy against Staphylococcus aureus and Escherichia coli were carried out, showing that all of the doped coatings had pronounced biocide activity.

Reconstruction of the static magnetic field of a magnetron

Science.gov (United States)

Krüger, Dennis; Köhn, Kevin; Gallian, Sara; Brinkmann, Ralf Peter

2018-06-01

The simulation of magnetron discharges requires a quantitatively correct mathematical model of the magnetic field structure. This study presents a method to construct such a model on the basis of a spatially restricted set of experimental data and a plausible a priori assumption on the magnetic field configuration. The example in focus is that of a planar circular magnetron. The experimental data are Hall probe measurements of the magnetic flux density in an accessible region above the magnetron plane [P. D. Machura et al., Plasma Sources Sci. Technol. 23, 065043 (2014)]. The a priori assumption reflects the actual design of the device, and it takes the magnetic field emerging from a center magnet of strength m C and vertical position d C and a ring magnet of strength m R , vertical position d R , and radius R. An analytical representation of the assumed field configuration can be formulated in terms of generalized hypergeometric functions. Fitting the ansatz to the experimental data with a least square method results in a fully specified analytical field model that agrees well with the data inside the accessible region and, moreover, is physically plausible in the regions outside of it. The outcome proves superior to the result of an alternative approach which starts from a multimode solution of the vacuum field problem formulated in terms of polar Bessel functions and vertical exponentials. As a first application of the obtained field model, typical electron and ion Larmor radii and the gradient and curvature drift velocities of the electron guiding center are calculated.

Microstructural evaluation of NiTi-based films deposited by magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Crăciunescu, Corneliu M., E-mail: corneliu.craciunescu@upt.ro; Mitelea, Ion, E-mail: corneliu.craciunescu@upt.ro; Budău, Victor, E-mail: corneliu.craciunescu@upt.ro [Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara (Romania); Ercuţa, Aurel [Department of Materials and Manufacturing Engineering, Politehnica University of Timisoara and Department of Physics, West University Timisoara (Romania)

2014-11-24

Shape memory alloy films belonging to the NiTi-based systems were deposited on heated and unheated substrates, by magnetron sputtering in a custom made system, and their structure and composition was analyzed using electron microscopy. Several substrates were used for the depositions: glass, Cu-Zn-Al, Cu-Al-Ni and Ti-NiCu shape memory alloy ribbons and kapton. The composition of the Ti-Ni-Cu films showed limited differences, compared to the one of the target and the microstructure for the DC magnetron sputtering revealed crystallized structure with features determined on peel off samples from a Si wafer. Both inter and transcrystalline fractures were observed and related to the interfacial stress developed on cooling from deposition temperature.

Properties of H- and D- beams from magnetron and Penning sources

International Nuclear Information System (INIS)

Sluyters, T.; Kovarik, V.

1979-01-01

The quality of negative hydrogen isotope beams are evaluated after extraction from magnetron and Penning sources. The general conclusions of these measurements are that: (a) the beam quality from these plasma sources are adequate for the transport of high current negative ion beams in bending magnets; (b) there is evidence of practically complete space charge neutralization in the drift space beyond the extractor; (c) the beam performance from the Penning source appears to be better compared with the magnetron source; and (d) it is likely that the high electric field gradient and a concave ion emission boundary are responsible for a beam cross-over near the anode aperture, which causes beam divergence practically independent of the extraction geometry

C. elegans bicd-1, homolog of the Drosophila dynein accessory factor Bicaudal D, regulates the branching of PVD sensory neuron dendrites.

Science.gov (United States)

Aguirre-Chen, Cristina; Bülow, Hannes E; Kaprielian, Zaven

2011-02-01

The establishment of cell type-specific dendritic arborization patterns is a key phase in the assembly of neuronal circuitry that facilitates the integration and processing of synaptic and sensory input. Although studies in Drosophila and vertebrate systems have identified a variety of factors that regulate dendrite branch formation, the molecular mechanisms that control this process remain poorly defined. Here, we introduce the use of the Caenorhabditis elegans PVD neurons, a pair of putative nociceptors that elaborate complex dendritic arbors, as a tractable model for conducting high-throughput RNAi screens aimed at identifying key regulators of dendritic branch formation. By carrying out two separate RNAi screens, a small-scale candidate-based screen and a large-scale screen of the ~3000 genes on chromosome IV, we retrieved 11 genes that either promote or suppress the formation of PVD-associated dendrites. We present a detailed functional characterization of one of the genes, bicd-1, which encodes a microtubule-associated protein previously shown to modulate the transport of mRNAs and organelles in a variety of organisms. Specifically, we describe a novel role for bicd-1 in regulating dendrite branch formation and show that bicd-1 is likely to be expressed, and primarily required, in PVD neurons to control dendritic branching. We also present evidence that bicd-1 operates in a conserved pathway with dhc-1 and unc-116, components of the dynein minus-end-directed and kinesin-1 plus-end-directed microtubule-based motor complexes, respectively, and interacts genetically with the repulsive guidance receptor unc-5.

High temperature superconducting films by rf magnetron sputtering

International Nuclear Information System (INIS)

Kadin, A.M.; Ballentine, P.H.

1989-01-01

The authors have produced sputtered films of Y-Ba-Cu-O and Bi-Sr-Ca-Cu-O by rf magnetron sputtering from an oxide target consisting of loose reacted powder. The use of a large 8-inch stoichiometric target in the magnetron mode permits films located above the central region to be free of negative-ion resputtering effects, and hence yields reproducible, uniform stoichiometric compositions for a wide range of substrate temperatures. Superconducting YBCO films have been obtained either by sputtering at low temperatures followed by an 850 0 C oxygen anneal, or alternatively by depositing onto substrates heated to ∼600 - 650 0 C and cooling in oxygen. Films prepared by the former method on cubic zirconia substrate consist of randomly oriented crystallites with zero resistance above 83 K. Those deposited on zirconia at medium temperatures without the high-temperature anneal contain smooth partially oriented crystallites, with a slightly depressed T/sub c/ ∼75K. Finally, superconducting films have been deposited on MgO using a BiSrCaCu/sub 2/O/sub x/ powder target

Laveren tussen ontspanning en solidariteit: de PvdA en de FNV ten tijde van de Poolse crisis (1980-1982)

NARCIS (Netherlands)

Miedema, C.

2013-01-01

The Polish independent trade union Solidarność appeared in a time of rising tension between East and West. This created a dilemma for Western left-wing movements: maintain solidarity with the Polish workers or continue the détente policy of the 1970s? The Dutch social democratic party PvdA and the

Hybrid plasma system for magnetron deposition of coatings with ion assistance

International Nuclear Information System (INIS)

Vavilin, K V; Kralkina, E A; Nekludova, P A; Petrov, A. K; Nikonov, A M; Pavlov, V B; Airapetov, A A; Odinokov, V V; Pavlov, G Ya; Sologub, V A

2016-01-01

The results of the study of the plasma hybrid system based on the combined magnetron discharge and high-frequency inductive discharge located in the external magnetic field is presented. Magnetron discharge provides the generation of atoms and ions of the target materials while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge. An external magnetic field is used to optimize the power input to the discharge, to increase the ion current density in the realm of substrate and to enhance the area of uniform plasma. The joint operation of magnetron and RF inductive discharge leads to a substantial increase (not equal to the sum of the parameters obtained under separate operation of two hybrid system channels) of the ion current density and intensity of sputtered material spectral lines radiation. Optimal mode of the hybrid plasma system operation provides uniform ion current density on the diameter of at least 150mm at 0.7PA argon pressure. The optimal values of the magnetic fields in the region of the substrate location lie in the range 2-8 mTl, while in the region of the RF input power unit lie in the range 0.5-25 mTl. (paper)

Analysis of the photo voltage decay /PVD/ method for measuring minority carrier lifetimes in P-N junction solar cells

Science.gov (United States)

Von Roos, O.

1981-01-01

The photo voltage decay (PVD) method for the measurement of minority carrier lifetimes in P-N junction solar cells with cell thickness comparable to or even less than the minority carrier diffusion length is examined. The method involves the generation of free carriers in the quasi-neutral bulk material by flashes of light and the monitoring of the subsequent decay of the induced open-circuit voltages as the carriers recombine, which is dependent on minority carrier recombination lifetime. It is shown that the voltage versus time curve for an ordinary solar cell (N(+)-P junction) is proportional to the inverse minority carrier lifetime plus a factor expressing the ratio of diffusion length to cell thickness. In the case of an ideal back-surface-field cell (N(+)-P-P(+) junction) however, the slope is directly proportional to the inverse minority carrier lifetime. It is noted that since most BSF cells are not ideal, possessing a sizable back surface recombination velocity, the PVD measurements must be treated with caution and supplemented with other nonstationary methods.

Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering

CERN Document Server

Ellmer, K; Weiss, V; Rossner, H

2001-01-01

A novel method is described for the in situ-investigation of nucleation and growth of thin films during magnetron sputtering. Energy dispersive X-ray diffraction with synchrotron light is used for the structural analysis during film growth. An in situ-magnetron sputtering chamber was constructed and installed at a synchrotron radiation beam line with a bending magnet. The white synchrotron light (1-70 keV) passes the sputtering chamber through Kapton windows and hits one of the substrates on a four-fold sample holder. The diffracted beam, observed under a fixed diffraction angle between 3 deg. and 10 deg., is energy analyzed by a high purity Ge-detector. The in situ-EDXRD setup is demonstrated for the growth of tin-doped indium oxide (ITO) films prepared by reactive magnetron sputtering from a metallic target.

Chromium-nanodiamond coatings obtained by magnetron sputtering and their tribological properties

Science.gov (United States)

Atamanov, M. V.; Khrushchov, M. M.; Marchenko, E. A.; Shevchenko, N. V.; Levin, I. S.; Petrzhik, M. I.; Miroshnichenko, V. I.; Relianu, M. D.

2017-07-01

Peculiarities of structure, chemical and phase composition, micromechanical and tribological properties of chromium-based coatings obtained by magnetron-sputtering of composite and/or compacted chromium-nanodiamond targets have been investigated.

Corrosion of thin, magnetron sputtered Nb_2O_5 films

International Nuclear Information System (INIS)

Pillis, Marina Fuser; Geribola, Guilherme Altomari; Scheidt, Guilherme; Gonçalves de Araújo, Edval; Lopes de Oliveira, Mara Cristina; Antunes, Renato Altobelli

2016-01-01

Highlights: • Niobium oxide based films were obtained by DC magnetron sputtering. • Different deposition times were tested. • The best corrosion resistance was obtained for the Nb_2O_5 film produced at 15′. • Film porosity determines the corrosion resistance. - Abstract: Niobium oxide based thin films were deposited on AISI 316 stainless steel substrates using reactive DC magnetron sputtering. Structure, composition and corrosion resistance of the niobium oxide films were studied. The corrosion behavior of the specimens was evaluated by electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization. The concentration of niobium and oxygen in the films was obtained by Rutherford backscattering spectroscopy (RBS). The film structure was analyzed by X-ray diffractometry. The corrosion resistance of the substrate was improved by the Nb_2O_5 layers. The best protective performance was achieved for the deposition time of 15 min.

Simulation of the electric potential and plasma generation coupling in magnetron sputtering discharges

Science.gov (United States)

Trieschmann, Jan; Krueger, Dennis; Schmidt, Frederik; Brinkmann, Ralf Peter; Mussenbrock, Thomas

2016-09-01

Magnetron sputtering typically operated at low pressures below 1 Pa is a widely applied deposition technique. For both, high power impulse magnetron sputtering (HiPIMS) as well as direct current magnetron sputtering (dcMS) the phenomenon of rotating ionization zones (also referred to as spokes) has been observed. A distinct spatial profile of the electric potential has been associated with the latter, giving rise to low, mid, and high energy groups of ions observed at the substrate. The adherent question of which mechanism drives this process is still not fully understood. This query is approached using Monte Carlo simulations of the heavy particle (i.e., ions and neutrals) transport consistently coupled to a pre-specified electron density profile via the intrinsic electric field. The coupling between the plasma generation and the electric potential, which establishes correspondingly, is investigated. While the system is observed to strive towards quasi-neutrality, distinct mechanisms governing the shape of the electric potential profile are identified. This work is supported by the German Research Foundation (DFG) in the frame of the transregional collaborative research centre TRR 87.

Catalytic growth of ZnO nanostructures by r.f. magnetron sputtering

Directory of Open Access Journals (Sweden)

Arroyo-Hernández María

2011-01-01

Full Text Available Abstract The catalytic effect of gold seed particles deposited on a substrate prior to zinc oxide (ZnO thin film growth by magnetron sputtering was investigated. For this purpose, selected ultra thin gold layers, with thicknesses close to the percolation threshold, are deposited by thermal evaporation in ultra high vacuum (UHV conditions and subsequently annealed to form gold nanodroplets. The ZnO structures are subsequently deposited by r.f. magnetron sputtering in a UHV chamber, and possible morphological differences between the ZnO grown on top of the substrate and on the gold are investigated. The results indicate a moderate catalytic effect for a deposited gold underlayer of 4 nm, quite close to the gold thin film percolation thickness.

RF Reactive Magnetron Sputter Deposition of Silicon Sub-Oxides

NARCIS (Netherlands)

Hattum, E.D. van

2007-01-01

RF reactive magnetron plasma sputter deposition of silicon sub oxide E.D. van Hattum Department of Physics and Astronomy, Faculty of Sciences, Utrecht University The work described in the thesis has been inspired and stimulated by the use of SiOx layers in the direct inductive printing technology,

The properties of B-Sb thin films prepared by molecular flow region PVD process

International Nuclear Information System (INIS)

Kumashiro, Y.; Nakamura, K.; Sato, K.; Ohtsuka, M.; Ohishi, Y.; Nakano, M.; Doi, Y.

2004-01-01

The present paper is the first description on the electrical and thermoelectric properties of amorphous PVD B 12 Sb 2 films prepared using the reaction of decaborane gas with evaporated antimony gas on Si (1900 A) / SiO x (3700 A) / Si (100) (625 μm) substrate at the temperature 350 deg. C. Ohmic metals contacts of the film were examined by making evaporated Al, followed by annealing at 200 deg. C. The comparatively high mobility of ∼100 cm 2 /V s and high thermoelectric figures-of-merit of ∼10 -4 /K were confirmed

Evaluación ergonómica de usuarios de PVD en la empresa: Construmer, SL

OpenAIRE

Martín, María Consuelo

2012-01-01

El objetivo de este informe es el de la evaluación ergonómica de los trabajadores como usuarios de PVD, y la estimación del nivel de riesgo que las condiciones de trabajo concretas respecto a éste, en el centro de trabajo referenciado arriba, pudieran provocar sobre los trabajadores que posean tal condición. El objeto proviene de la necesidad de dar cumplimiento a la exigencia legal impuesta por la ley 31/95, de 8 de Noviembre, sobre Prevención de Riesgos Laborales.

Computer simulation of sputtering of graphite target in magnetron sputtering device with two zones of erosion

Directory of Open Access Journals (Sweden)

Bogdanov R.V.

2015-03-01

Full Text Available A computer simulation program for discharge in a magnetron sputtering device with two erosion zones was developed. Basic laws of the graphite target sputtering process and transport of sputtered material to the substrate were taken into account in the Monte Carlo code. The results of computer simulation for radial distributions of density and energy flux of carbon atoms on the substrate (at different values of discharge current and pressure of the working gas confirmed the possibility of obtaining qualitative homogeneous films using this magnetron sputtering device. Also the discharge modes were determined for this magnetron sputtering device, in which it was possible to obtain such energy and density of carbon atoms fluxes, which were suitable for deposition of carbon films containing carbon nanotubes and other nanoparticles.

Magnetron co-sputtering system for coating ICF targets

International Nuclear Information System (INIS)

Hsieh, E.J.; Meyer, S.F.; Halsey, W.G.; Jameson, G.T.; Wittmayer, F.J.

1981-01-01

Fabrication of Inertial Confinement Fusion (ICF) targets requires deposition of various types of coatings on microspheres. The mechanical strength, and surface finish of the coatings are of concern in ICF experiments. The tensile strength of coatings can be controlled through grain refinement, selective doping and alloy formation. We have constructed a magnetron co-sputtering system to produce variable density profile coatings with high tensile strength on microspheres

Special traits of the millimeter wave relativistic magnetron

International Nuclear Information System (INIS)

Berdin, S.A.; Chizhov, K.V.; Gadetski, N.P.; Korenev, V.G.; Lebedenko, A.N.; Marchenko, M.I.; Magda, I.I.; Melezhik, O.G.; Sinitsin, V.G.; Soshenko, V.A.

2014-01-01

A 8 mm band relativistic magnetron is investigated experimentally and by means of numerical simulation. The physical effects are analyzed which influence negatively the r.f. generation. The processes capable of reducing effectiveness of the generation and duration of the generated pulse include forward and backward axial flows of electrons, and intense electric fields - the generated microwaves and the fields owing to the space charge

Development of a PVD-based manufacturing process of monolithic LEU irradiation targets for {sup 99}Mo production

Energy Technology Data Exchange (ETDEWEB)

Hollmer, Tobias

2015-08-03

{sup 99}Mo is the most important radioisotope in nuclear medicine. It is produced by fission of uranium in irradiation targets. The usage of cylindrical monolithic targets can ensure a safe supply of {sup 99}Mo and at the same reduce the amount of highly radioactive waste generated during production. To manufacture these targets, a novel PVD-based technique was developed. Both the feasibility and the high efficiency of this process were demonstrated in a prototype apparatus.

Injection moulding of optical functional micro structures using laser structured, PVD-coated mould inserts

Energy Technology Data Exchange (ETDEWEB)

Hopmann, Ch.; Weber, M.; Schöngart, M.; Schäfer, C., E-mail: weber@ikv-aachen.de [Institute of Plastics Processing (IKV) at RWTH Aachen University (Germany); Bobzin, K.; Bagcivan, N.; Brögelmann, T.; Theiß, S.; Münstermann, T. [Surface Engineering Institute (IOT), RWTH Aachen University, Aachen (Germany); Steger, M. [Fraunhofer Institute for Laser Technology (ILT), Aachen (Germany)

2015-05-22

Micro structured optical plastics components are intensively used i. e. in consumer electronics, for optical sensors in metrology, innovative LED-lighting or laser technology. Injection moulding has proven to be successful for the large-scale production of those parts. However, the production of those parts still causes difficulties due to challenges in the moulding and demoulding of plastics parts created with laser structured mould inserts. A complete moulding of the structures often leads to increased demoulding forces, which then cause a breaking of the structures and a clogging of the mould. An innovative approach is to combine PVD-coated (physical vapour deposition), laser structured inserts and a variothermal moulding process to create functional mic8iüro structures in a one-step process. Therefore, a PVD-coating is applied after the laser structuring process in order to improve the wear resistance and the anti-adhesive properties against the plastics melt. In a series of moulding trials with polycarbonate (PC) and polymethylmethacrylate (PMMA) using different coated moulds, the mould temperature during injection was varied in the range of the glass transition and the melt temperature of the polymers. Subsequently, the surface topography of the moulded parts is evaluated by digital 3D laser-scanning microscopy. The influence of the moulding parameters and the coating of the mould insert on the moulding accuracy and the demoulding behaviour are being analysed. It is shown that micro structures created by ultra-short pulse laser ablation can be successfully replicated in a variothermal moulding process. Due to the mould coating, significant improvements could be achieved in producing micro structured optical plastics components.

Prediction of the properties of PVD/CVD coatings with the use of FEM analysis

Science.gov (United States)

Śliwa, Agata; Mikuła, Jarosław; Gołombek, Klaudiusz; Tański, Tomasz; Kwaśny, Waldemar; Bonek, Mirosław; Brytan, Zbigniew

2016-12-01

The aim of this paper is to present the results of the prediction of the properties of PVD/CVD coatings with the use of finite element method (FEM) analysis. The possibility of employing the FEM in the evaluation of stress distribution in multilayer Ti/Ti(C,N)/CrN, Ti/Ti(C,N)/(Ti,Al)N, Ti/(Ti,Si)N/(Ti,Si)N, and Ti/DLC/DLC coatings by taking into account their deposition conditions on magnesium alloys has been discussed in the paper. The difference in internal stresses in the zone between the coating and the substrate is caused by, first of all, the difference between the mechanical and thermal properties of the substrate and the coating, and also by the structural changes that occur in these materials during the fabrication process, especially during the cooling process following PVD and CVD treatment. The experimental values of stresses were determined based on X-ray diffraction patterns that correspond to the modelled values, which in turn can be used to confirm the correctness of the accepted mathematical model for testing the problem. An FEM model was established for the purpose of building a computer simulation of the internal stresses in the coatings. The accuracy of the FEM model was verified by comparing the results of the computer simulation of the stresses with experimental results. A computer simulation of the stresses was carried out in the ANSYS environment using the FEM method. Structure observations, chemical composition measurements, and mechanical property characterisations of the investigated materials has been carried out to give a background for the discussion of the results that were recorded during the modelling process.

Recent operation of the FNAL magnetron H- ion source

Science.gov (United States)

Karns, P. R.; Bollinger, D. S.; Sosa, A.

2017-08-01

This paper will detail changes in the operational paradigm of the Fermi National Accelerator Laboratory (FNAL) magnetron H- ion source due to upgrades in the accelerator system. Prior to November of 2012 the H- ions for High Energy Physics (HEP) experiments were extracted at ˜18 keV vertically downward into a 90 degree bending magnet and accelerated through a Cockcroft-Walton accelerating column to 750 keV. Following the upgrade in the fall of 2012 the H- ions are now directly extracted from a magnetron at 35 keV and accelerated to 750 keV by a Radio Frequency Quadrupole (RFQ). This change in extraction energy as well as the orientation of the ion source required not only a redesign of the ion source, but an updated understanding of its operation at these new values. Discussed in detail are the changes to the ion source timing, arc discharge current, hydrogen gas pressure, and cesium delivery system that were needed to maintain consistent operation at >99% uptime for HEP, with an increased ion source lifetime of over 9 months.

Status and prospects of a compact FIR FEL driven by a magnetron-based microtron

International Nuclear Information System (INIS)

Jeong, Young Uk; Kazakevitch, Grigori M.; Lee, Byung Cheol; Kim, Sun Kook; Cho, Sung Oh; Gavrilov, Nicolai G.; Lee, Jongmin

2002-01-01

A magnetron-based microtron as a driver of FIR FEL has several prominent advantages in cost, size, beam quality and operation convenience. However, it has some disadvantages due to the instability of the RF frequency and a low current. In order to overcome these disadvantages, the frequency stability of the magnetron was improved, and the interaction between the electron beam and the FIR radiation was enhanced by using a high-performance undulator and a low-loss waveguide-mode optical resonator. The FEL is now under upgrade in order to extend the wavelength range to cover 90-300 μm, which can be done by increasing the energy range of electron beam to 4.3-7 MeV. In this paper, we report the results of investigations on output characteristics of the FEL depending on cavity detuning, electron beam matching, and RF instability. Based on the results, we discuss the prospects of wide-band FIR FELs driven by magnetron-based microtrons as potent sources of radiation for scientific applications

Fabrication and characterization of flaky core-shell particles by magnetron sputtering silver onto diatomite

Science.gov (United States)

Wang, Yuanyuan; Zhang, Deyuan; Cai, Jun

2016-02-01

Diatomite has delicate porous structures and various shapes, making them ideal templates for microscopic core-shell particles fabrication. In this study, a new process of magnetron sputtering assisted with photoresist positioning was proposed to fabricate lightweight silver coated porous diatomite with superior coating quality and performance. The diatomite has been treated with different sputtering time to investigate the silver film growing process on the surface. The morphologies, constituents, phase structures and surface roughness of the silver coated diatomite were analyzed with SEM, EDS, XRD and AFM respectively. The results showed that the optimized magnetron sputtering time was 8-16 min, under which the diatomite templates were successfully coated with uniform silver film, which exhibits face centered cubic (fcc) structure, and the initial porous structures were kept. Moreover, this silver coating has lower surface roughness (RMS 4.513 ± 0.2 nm) than that obtained by electroless plating (RMS 15.692 ± 0.5 nm). And the infrared emissivity of coatings made with magnetron sputtering and electroless plating silver coated diatomite can reach to the lowest value of 0.528 and 0.716 respectively.

Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

Czech Academy of Sciences Publication Activity Database

Martines, E.; Zuin, M.; Cavazzana, R.; Adámek, Jiří; Antoni, V.; Serianni, G.; Spolaore, M.; Vianello, N.

2014-01-01

Roč. 21, č. 10 (2014), s. 102309-102309 ISSN 1070-664X Institutional support: RVO:61389021 Keywords : Drift waves * Magnetron sputtering plasma * Spatiotemporal synchronization Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 2.142, year: 2014 http://dx.doi.org/10.1063/1.4898693

Experimental study on an S-band near-field microwave magnetron power transmission system on hundred-watt level

Science.gov (United States)

Zhang, Biao; Jiang, Wan; Yang, Yang; Yu, Chengyang; Huang, Kama; Liu, Changjun

2015-11-01

A multi-magnetron microwave source, a metamaterial transmitting antenna, and a large power rectenna array are presented to build a near-field 2.45 GHz microwave power transmission system. The square 1 m2 rectenna array consists of sixteen rectennas with 2048 Schottky diodes for large power microwave rectifying. It receives microwave power and converts them into DC power. The design, structure, and measured performance of a unit rectenna as well as the entail rectenna array are presented in detail. The multi-magnetron microwave power source switches between half and full output power levels, i.e. the half-wave and full-wave modes. The transmission antenna is formed by a double-layer metallic hole array, which is applied to combine the output power of each magnetron. The rectenna array DC output power reaches 67.3 W on a 1.2 Ω DC load at a distance of 5.5 m from the transmission antenna. DC output power is affected by the distance, DC load, and the mode of microwave power source. It shows that conventional low power Schottky diodes can be applied to a microwave power transmission system with simple magnetrons to realise large power microwave rectifying.

Etching characteristics and application of physical-vapor-deposited amorphous carbon for multilevel resist

International Nuclear Information System (INIS)

Kim, H. T.; Kwon, B. S.; Lee, N.-E.; Park, Y. S.; Cho, H. J.; Hong, B.

2008-01-01

For the fabrication of a multilevel resist (MLR) based on a very thin, physical-vapor-deposited (PVD) amorphous carbon (a-C) layer, the etching characteristics of the PVD a-C layer with a SiO x hard mask were investigated in a dual-frequency superimposed capacitively coupled plasma etcher by varying the following process parameters in O 2 /N 2 /Ar plasmas: high-frequency/low-frequency combination (f HF /f LF ), HF/LF power ratio (P HF /P LF ), and O 2 and N 2 flow rates. The very thin nature of the a-C layer helps to keep the aspect ratio of the etched features low. The etch rate of the PVD a-C layer increased with decreasing f HF /f LF combination and increasing P LF and was initially increased but then decreased with increasing N 2 flow rate in O 2 /N 2 /Ar plasmas. The application of a 30 nm PVD a-C layer in the MLR structure of ArF PR/BARC/SiO x /PVD a-C/TEOS oxide supported the possibility of using a very thin PVD a-C layer as an etch-mask layer for the TEOS-oxide layer

Magnetron based high energy S-band linac system

International Nuclear Information System (INIS)

Tiwari, T.; Krishnan, R.; Phatangare, Manoj

2012-01-01

This paper deals with the study of magnetron based high energy S-band linear accelerator (linac) system operating at spot frequency 2.998 GHz. The energy and dose are two important parameters of linac system which depend on input power of microwave source and length of linac tube. Here the author has studied how these parameters can be improved for side coupled standing wave S-band linac system

High power pulsed magnetron sputtering: A method to increase deposition rate

International Nuclear Information System (INIS)

Raman, Priya; McLain, Jake; Ruzic, David N; Shchelkanov, Ivan A.

2015-01-01

High power pulsed magnetron sputtering (HPPMS) is a state-of-the-art physical vapor deposition technique with several industrial applications. One of the main disadvantages of this process is its low deposition rate. In this work, the authors report a new magnetic field configuration, which produces deposition rates twice that of conventional magnetron's dipole magnetic field configuration. Three different magnet pack configurations are discussed in this paper, and an optimized magnet pack configuration for HPPMS that leads to a higher deposition rate and nearly full-face target erosion is presented. The discussed magnetic field produced by a specially designed magnet assembly is of the same size as the conventional magnet assembly and requires no external fields. Comparison of deposition rates with different power supplies and the electron trapping efficiency in complex magnetic field arrangements are discussed

Morphology and inhibition performance of Ag thin film as antimicrobial coating deposited by RF-PVD on 316 L stainless steel

Science.gov (United States)

Purniawan, A.; Khrisna, Y. S. A.; Rasyida, A.; Atmono, T. M.

2018-04-01

Foreign body related infection (FBRIs) is caused by forming biofilm of bacterial colony of medical equipment surfaces. In many cases, the FBRIs is still happened on the surface after medical sterilization process has been performed. In order to avoid the case, surface modification by antimicrobial coating was used. In this work, we present silver (Ag) thin film on 316 L stainless steel substrate surface was deposited using Radio Frequency Sputtering PVD (RF-PVD). The morphology of Ag thin film were characterized using SEM-EDX. Surface roughness of the thin film was measured by AFM. In addition, Kirby Bauer Test in Escherichia coli (E. coli) was conducted in order to evaluate the inhibition performance of the Ag thin film antimicrobial coating. Based on SEM and AFM results show that the particle size is increased from 523 nm to 708 nm and surface roughness from 9 to 20 nm for deposition time 10 minutes to 20 minutes, respectively. In addition, the inhibition layer of the coating is about 29 mm.

Industrial inline PVD metallization for silicon solar cells with laser fired contacts leading to 21.8% efficiency

OpenAIRE

Nekarda, J.; Reinwand, D.; Hartmann, P.; Preu, R.

2010-01-01

In this contribution we present the latest results of our experiments in regard to an industrially feasible inline physical vapor deposition (PVD) metallization method for the rear side of passivated solar cells. In an earlier publication, the quality of such processed layers and the feasibility of the tool was already shown and compared with a commonly used laboratory process based on electron beam evaporation. Since then a difference in the Voc potential in the range of ~ 4 mV between both ...

Additive manufactured Ti6Al4V scaffolds with the RF- magnetron sputter deposited hydroxyapatite coating

International Nuclear Information System (INIS)

Chudinova, E; Surmeneva, M; Surmenev, R; Koptioug, A; Scoglund, P

2016-01-01

Present paper reports on the results of surface modification of the additively manufactured porous Ti6Al4V scaffolds. Radio frequency (RF) magnetron sputtering was used to modify the surface of the alloy via deposition of the biocompatible hydroxyapatite (HA) coating. The surface morphology, chemical and phase composition of the HA-coated alloy were studied. It was revealed that RF magnetron sputtering allows preparing a homogeneous HA coating onto the entire surface of scaffolds. (paper)

Surface characteristics of hydroxyapatite-coated layer prepared on nanotubular Ti–35Ta–xHf alloys by EB-PVD

Energy Technology Data Exchange (ETDEWEB)

Jeong, Yong-Hoon [Department of Dental Materials and Research Center of Nano-Interface Activation for Biomaterials, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Biomechanics and Tissue Engineering Laboratory, Division of Orthodontics, College of Dentistry, The Ohio State University, Columbus, OH (United States); Moon, Byung-Hak [Department of Dental Materials and Research Center of Nano-Interface Activation for Biomaterials, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Choe, Han-Cheol, E-mail: hcchoe@chosun.ac.kr [Department of Dental Materials and Research Center of Nano-Interface Activation for Biomaterials, School of Dentistry, Chosun University, Gwangju (Korea, Republic of); Brantley, William A. [Division of Restorative, Prosthetic and Primary Care Dentistry, College of Dentistry, The Ohio State University, Columbus, OH (United States)

2013-12-31

In this study, we investigated the surface characteristics of hydroxyapatite (HA)-coated layers prepared by electron-beam physical vapor deposition (EB-PVD) on nanotubular Ti–35Ta–xHf alloys (x = 3, 7, and 15 wt.%). Ti–35Ta–xHf alloys were first prepared by arc melting. Formation of a nanotube structure on these alloys was achieved by an electrochemical method in 1 M H{sub 3}PO{sub 4} + 0.8 wt.% NaF electrolytes. The HA coatings were then deposited on the nanotubular surface by an EB-PVD method. The surface characteristics were analyzed by field-emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, and X-ray diffraction (XRD). The electrochemical behavior was examined using a potentiodynamic polarization test in 0.9% NaCl solution. The Ti–35Ta–xHf alloys had an equiaxed grain structure with α″ + β phases, and the α″ phase disappeared with increases in Hf content. The Ti–35Ta–15Hf alloy showed higher β-phase peak intensity in the XRD patterns than that for the lower Hf-content alloys. A highly ordered nanotubular oxide layer was formed on the Ti–35Ta–15Hf alloy, and the tube length depended on Hf content. The HA coating surface formed at traces of the nanotubular titanium oxide layer and completely covered the tips of the nanotubes with a cluster shape. From the potentiodynamic polarization tests, the incorporation of Hf element and formation of the nanotubular structure were the main factors for achieving lower current density. In particular, the surface of the HA coating on the nanotubular structure exhibited higher corrosion resistance than that of the nanotubular titanium oxide structure without an HA coating. - Highlights: • Hydroxyapatite (HA) was coated on nanotubular Ti–35Ta–xHf alloys, using EB-PVD. • Increasing the Hf content reduced the relative proportion of α″ martensite to β-Ti in the microstructures. • The detailed nanotubular structure formed by anodization depended on alloy composition

Surface characteristics of hydroxyapatite-coated layer prepared on nanotubular Ti–35Ta–xHf alloys by EB-PVD

International Nuclear Information System (INIS)

Jeong, Yong-Hoon; Moon, Byung-Hak; Choe, Han-Cheol; Brantley, William A.

2013-01-01

In this study, we investigated the surface characteristics of hydroxyapatite (HA)-coated layers prepared by electron-beam physical vapor deposition (EB-PVD) on nanotubular Ti–35Ta–xHf alloys (x = 3, 7, and 15 wt.%). Ti–35Ta–xHf alloys were first prepared by arc melting. Formation of a nanotube structure on these alloys was achieved by an electrochemical method in 1 M H 3 PO 4 + 0.8 wt.% NaF electrolytes. The HA coatings were then deposited on the nanotubular surface by an EB-PVD method. The surface characteristics were analyzed by field-emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, and X-ray diffraction (XRD). The electrochemical behavior was examined using a potentiodynamic polarization test in 0.9% NaCl solution. The Ti–35Ta–xHf alloys had an equiaxed grain structure with α″ + β phases, and the α″ phase disappeared with increases in Hf content. The Ti–35Ta–15Hf alloy showed higher β-phase peak intensity in the XRD patterns than that for the lower Hf-content alloys. A highly ordered nanotubular oxide layer was formed on the Ti–35Ta–15Hf alloy, and the tube length depended on Hf content. The HA coating surface formed at traces of the nanotubular titanium oxide layer and completely covered the tips of the nanotubes with a cluster shape. From the potentiodynamic polarization tests, the incorporation of Hf element and formation of the nanotubular structure were the main factors for achieving lower current density. In particular, the surface of the HA coating on the nanotubular structure exhibited higher corrosion resistance than that of the nanotubular titanium oxide structure without an HA coating. - Highlights: • Hydroxyapatite (HA) was coated on nanotubular Ti–35Ta–xHf alloys, using EB-PVD. • Increasing the Hf content reduced the relative proportion of α″ martensite to β-Ti in the microstructures. • The detailed nanotubular structure formed by anodization depended on alloy composition. • The

Blue Diode Laser Absorption Spectroscopy of Pulsed Magnetron Discharge

Czech Academy of Sciences Publication Activity Database

Olejníček, Jiří; Do, H.T.; Hubička, Zdeněk; Hippler, R.; Jastrabík, Lubomír

2006-01-01

Roč. 45, 10B (2006), s. 8090-8094 ISSN 0021-4922 R&D Projects: GA AV ČR 1QS100100563; GA ČR GA202/05/2242 Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z10100520 Keywords : laser absorption spectroscopy * pulsed magnetron * sputtering parameters Subject RIV: BH - Optics, Masers, Lasers Impact factor: 1.222, year: 2006

Analysis of conditions for magnetron discharge initiation at vacuum camera testing

International Nuclear Information System (INIS)

Tzeneva, Raina; Dineff, Peter; Darjanova, Denitza

2002-01-01

Models of electric field distribution for two typical cases of vacuum camera internal pressure control are investigated. New relations between the maximum magnetron discharge current value I max and the maximum electric field strength radial component value E τ max are established. (Author)

Improved mechanical properties of Ni-rich Ni3Al coatings produced by EB-PVD for repairing single crystal blades

Institute of Scientific and Technical Information of China (English)

Jing-Yong Sun; Yan-Ling Pei; Shu-Suo Li; Hu Zhang; Sheng-Kai Gong

2017-01-01

Active control of turbine blade tip clearance for aircraft engine continues to be a concern in engine operation,because turbine blades are subjected to wear and therefore cause an increasing tip clearance between the rotating blades and the shroud and also reduce the engine efficiency.In this work,a Ni-rich Ni3Al coating with γ'/γtwo-phase microstructure was deposited by electron beam physical vapor deposition (EB-PVD),which worked as repairing the worn blade tips of single crystal blades.Nb molten pool was used to increase the molten pool temperature and thus to enhance the deposition rate.The microstructures and mechanical properties can be modified by the deposition temperatures and the following heat treatments.All coatings consist of γ'and γ phases.At deposition temperature of 600 ℃,a dense microstructure can be achieved to produce a coating with grain size of ～ 1 μm and microhardness of ～HV 477.After being heated for 4 h at a temperature of 1,100 ℃,the coatings have a more uniform microstructure,and microhardness maintains at a high level of ～ HV 292.Effect of Hf and Zr on EB-PVD Ni3Al repair coating will be further investigated.

Lithium ion conducting PVA:PVdF polymer electrolytes doped with nano SiO2 and TiO2 filler

Science.gov (United States)

Hema, M.; Tamilselvi, P.

2016-09-01

The effect of nano SiO2 and TiO2 fillers on the thermal, mechanical and electrochemical properties of PVA:PVdF:LiCF3SO3 have been investigated by three optimized systems of SPE (80PVA:20PVdF:15LiCF3SO3), CPE-I (SPE:8SiO2) and CPE-II (SPE:4TiO2). From the TGA curve least weight loss has been observed for CPE-II indicating high thermal stability compared to other systems. Stress-strain curve of the prepared samples confirm the enhancement of tensile strength in CPE-II compared to CPE-I and SPE. Conductivity studies show that addition of TiO2 filler slightly enhances ionic conductivity 3.7×10-3 S cm-1 compared to filler free system at 303 K. Dielectric plots have been analyzed and CPE-II possesses higher dielectric constant compared to CPE-I and filler free system. Temperature dependence of modulus plots has been studied for highest conductivity possessing sample. Wider electrochemical stability has been obtained for nano-composite polymer electrolytes. The results conclude that the prepared CPE-II shows the best performance and it will be well suited for lithium ion batteries.

Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering

International Nuclear Information System (INIS)

Agnarsson, B.; Magnus, F.; Tryggvason, T.K.; Ingason, A.S.; Leosson, K.; Olafsson, S.; Gudmundsson, J.T.

2013-01-01

Thin TiO 2 films were grown on Si(001) substrates by reactive dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) at temperatures ranging from 300 to 700 °C. Optical and structural properties of films were compared both before and after post-annealing using scanning electron microscopy, low angle X-ray reflection (XRR), grazing incidence X-ray diffractometry and spectroscopic ellipsometry. Both dcMS- and HiPIMS-grown films reveal polycrystalline rutile TiO 2 , even prior to post-annealing. The HiPIMS-grown films exhibit significantly larger grains compared to that of dcMC-grown films, approaching 100% of the film thickness for films grown at 700 °C. In addition, the XRR surface roughness of HiPIMS-grown films was significantly lower than that of dcMS-grown films over the whole temperature range 300–700 °C. Dispersion curves could only be obtained for the HiPIMS-grown films, which were shown to have a refractive index in the range of 2.7–2.85 at 500 nm. The results show that thin, rutile TiO 2 films, with high refractive index, can be obtained by HiPIMS at relatively low growth temperatures, without post-annealing. Furthermore, these films are smoother and show better optical characteristics than their dcMS-grown counterparts. - Highlights: • We demonstrate growth of rutile TiO 2 on Si (111) by high power impulse magnetron sputtering. • The films exhibit significantly larger grains than dc magnetron sputtered films • TiO 2 films with high refractive index are obtained without post-growth annealing

A hybrid electron cyclotron resonance metal ion source with integrated sputter magnetron for the production of an intense Al{sup +} ion beam

Energy Technology Data Exchange (ETDEWEB)

Weichsel, T., E-mail: tim.weichsel@fep.fraunhofer.de; Hartung, U.; Kopte, T. [Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, 01277 Dresden (Germany); Zschornack, G. [Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany); Kreller, M.; Philipp, A. [DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)

2015-09-15

A metal ion source prototype has been developed: a combination of magnetron sputter technology with 2.45 GHz electron cyclotron resonance (ECR) ion source technology—a so called magnetron ECR ion source (MECRIS). An integrated ring-shaped sputter magnetron with an Al target is acting as a powerful metal atom supply in order to produce an intense current of singly charged metal ions. Preliminary experiments show that an Al{sup +} ion current with a density of 167 μA/cm{sup 2} is extracted from the source at an acceleration voltage of 27 kV. Spatially resolved double Langmuir probe measurements and optical emission spectroscopy were used to study the plasma states of the ion source: sputter magnetron, ECR, and MECRIS plasma. Electron density and temperature as well as Al atom density were determined as a function of microwave and sputter magnetron power. The effect of ECR heating is strongly pronounced in the center of the source. There the electron density is increased by one order of magnitude from 6 × 10{sup 9} cm{sup −3} to 6 × 10{sup 10} cm{sup −3} and the electron temperature is enhanced from about 5 eV to 12 eV, when the ECR plasma is ignited to the magnetron plasma. Operating the magnetron at constant power, it was observed that its discharge current is raised from 1.8 A to 4.8 A, when the ECR discharge was superimposed with a microwave power of 2 kW. At the same time, the discharge voltage decreased from about 560 V to 210 V, clearly indicating a higher plasma density of the MECRIS mode. The optical emission spectrum of the MECRIS plasma is dominated by lines of excited Al atoms and shows a significant contribution of lines arising from singly ionized Al. Plasma emission photography with a CCD camera was used to prove probe measurements and to identify separated plasma emission zones originating from the ECR and magnetron discharge.

Effect of Hexagonal Phase Content on Wear Behaviour of AlTiN Arc PVD Coatings

Directory of Open Access Journals (Sweden)

Joern Kohlscheen

2018-02-01

Full Text Available In this study, the effect of increasing aluminum content and magnetic steering field strength on the structure and wear behavior of arc PVD AlTiN coatings is discussed. Deposition was done by means of an industrial-scale PVD unit for tool coating. The aluminium content in the AlTi source material was increased from 67 to 73 at.%. We applied two settings of the magnetic field that steers the arc across the cathode surface thereby evaporating the AlTi alloy differently. The resulting coating thickness ranged from 3.5 to about 7 µm. Cemented tungsten carbide was used as substrate material. Coating properties like hardness, adhesion, and crystal phases were analyzed by indentation and X-ray diffraction, respectively. The wear behaviour of the different AlTiN hard coatings were investigated in two ways. In a first idealized test, cyclic impacting was done applying a constant force. The resulting wear pattern was quantified by an Alicona multi-focus microscope. A second wear test was done by metal cutting under realistic conditions. Fly milling of ductile cast iron (EN-GJS-700 was performed with regular interruptions in order to measure the increasing wear mark. As expected, aluminium contents above 67 at.% (in the metal fraction of the coating lead to a decreased wear resistance as the soft hexagonal phase exceeds values of a few vol.%. However, it was found that the formation of the hexagonal phase can be effectively influenced and delayed by increasing the magnetic steering field at the cathode. The wear behavior observed in cyclic impact testing corresponds well to results obtained with the more complex loading situation encountered in milling.

Investigations on Wear Mechanisms of PVD Coatings on Carbides and Sialons

Directory of Open Access Journals (Sweden)

Staszuk M.

2017-12-01

Full Text Available The paper presents the results on the wear resistance of PVD coatings on cutting inserts made from sintered carbide and sialon ceramics. The exploitative properties of coatings in technological cutting trials were defined in the paper, which also examined the adhesion of coatings to the substrate, the thickness of the coating, and the microhardness. As a result, it was found that isomorphic coating with AlN-h phase of covalent interatomic bonds exhibits much better adhesion to the sialon substrate than isomorphic coating with titanium nitride TiN. These coatings assure the high wear resistance of the coated tools, and the high adhesion combined with the high microhardness and fine-grained structure assure an increase in the exploitative life of the coated tools. In the case of coatings on substrate made from sintered carbide, there was a significant influence on the properties of the tools coated with them as concerns the existence of the diffusion zone between the substrate and the coating.

Estimation of Sputtering Damages on a Magnetron H- Ion Source Induced by Cs+ and H+ Ions

CERN Document Server

Pereira, H; Alessi, J; Kalvas, t

2013-01-01

An H− ion source is being developed for CERN’s Linac4 accelerator. A beam current requirement of 80 mA and a reliability above 99% during 1 year with 3 month uninterrupted operation periods are mandatory. To design a low-maintenance long life-time source, it is important to investigate and understand the wear mechanisms. A cesiated plasma discharge ion source, such as the BNL magnetron source, is a good candidate for the Linac4 ion source. However, in the magnetron source operated at BNL, the removal of material from the molybdenum cathode and the stainless steel anode cover plate surfaces is visible after extended operation periods. The observed sputtering traces are shown to result from cesium vapors and hydrogen gas ionized in the extraction region and subsequently accelerated by the extraction field. This paper presents a quantitative estimate of the ionization of cesium and hydrogen by the electron and H− beams in the extraction region of BNL’s magnetron ion source. The respective contributions o...

Investigation of the Effect of Residual Stress Gradient on the Wear Behavior of PVD Thin Films

Science.gov (United States)

Tlili, B.; Nouveau, C.; Guillemot, G.; Besnard, A.; Barkaoui, A.

2018-02-01

The control of residual stresses has been seldom investigated in multilayer coatings dedicated to improvement of wear behavior. Here, we report the preparation and characterization of superposed structures composed of Cr, CrN and CrAlN layers. Nano-multilayers CrN/CrAlN and Cr/CrN/CrAlN were deposited by Physical Vapor Deposition (PVD) onto Si (100) and AISI4140 steel substrates. The Cr, CrN and CrAlN monolayers were developed with an innovative approach in PVD coatings technologies corresponding to deposition with different residual stresses levels. Composition and wear tracks morphologies of the coatings were characterized by scanning electron microscopy, high-resolution transmission electron microscopy, atomic force microscopy, x-ray photoelectron spectroscopy, energy-dispersive x-ray spectroscopy, x-ray diffraction and 3D-surface analyzer. The mechanical properties (hardness, residual stresses and wear) were investigated by nanoindentation, interferometry and micro-tribometry (fretting-wear tests). Observations suggest that multilayer coatings are composed mostly of nanocrystalline. The residual stresses level in the films has practically affected all the physicochemical and mechanical properties as well as the wear behavior. Consequently, it is demonstrated that the coating containing moderate stresses has a better wear behavior compared to the coating developed with higher residual stresses. The friction contact between coated samples and alumina balls shows also a large variety of wear mechanisms. In particular, the abrasive wear of the coatings was a combination of plastic deformation, fine microcracking and microspallation. The application of these multilayers will be wood machining of green wood.

The limits of application of variable-energy slow positron beams for investigating TiN hard coatings prepared by PVD

International Nuclear Information System (INIS)

Marek, T.; Suevegh, K.; Vertes, A.; Szeles, Cs.; Lynn, K.G.

2000-01-01

Samples of TiN hard coatings prepared by physical vapour deposition (PVD) were investigated by means of depth-sensitive positron annihilation spectroscopy. The results indicate that the samples are at the limits of the applicability of this method presumably due to the high defect concentration. Though the samples are thoroughly characterized by other independent methods, they might not be sufficient to explain all aspects of positron-solid interactions in these cases. (author)

Mechanical properties of EB-PVD ZrO{sub 2} thermal barrier coatings; Mechanische Eigenschaften von EB-PVD ZrO{sub 2} Waermedaemmschichten

Energy Technology Data Exchange (ETDEWEB)

Held, Carolin

2014-08-29

In this work, the elastic properties of thermal barrier coatings which were produced by electron-beam enhanced physical vapour deposition were investigated, as well as the dependency of the properties on the sample microstructure, the thermal treatment and the test method. For this purpose, not only commercial coatings were characterized, but also special sample material was used which consists of a 1 mm thick layer of EB-PVD TBC. This material was isothermally heat treated for different times at 950 C, 1100 C and 1200 C and then tested in a specially developed miniaturized bend test and by dynamic mechanical analysis. The sample material was tested by nanoindentation in order to measure the Young's modulus on a local scale, and the porosity of the samples was determined by microstructure analysis and porosimetry. The decrease of porosity could be connected with sintering and subsequent stiffening of the material. The test results are dependent on the tested volume. A small test volume leads to larger measured Young's moduli, while a large test volume yields lower values. The test volume also has an influence on the increase of stiffness during thermal exposure. With a small tested volume, a quicker increase of the Young's modulus was registered, which could be associated to the sintering of local structures.

Plasma properties of RF magnetron sputtering system using Zn target

Energy Technology Data Exchange (ETDEWEB)

Nafarizal, N.; Andreas Albert, A. R.; Sharifah Amirah, A. S.; Salwa, O.; Riyaz Ahmad, M. A. [Microelectronic and Nanotechnology - Shamsuddin Research Centre (MiNT-SRC), Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia 86400 Parit Raja, Batu Pahat, Johor (Malaysia)

2012-06-29

In the present work, we investigate the fundamental properties of magnetron sputtering plasma using Zn target and its deposited Zn thin film. The magnetron sputtering plasma was produced using radio frequency (RF) power supply and Argon (Ar) as ambient gas. A Langmuir probe was used to collect the current from the plasma and from the current intensity, we calculate the electron density and electron temperature. The properties of Zn sputtering plasma at various discharge conditions were studied. At the RF power ranging from 20 to 100 W and gas pressure 5 mTorr, we found that the electron temperature was almost unchanged between 2-2.5 eV. On the other hand, the electron temperature increased drastically from 6 Multiplication-Sign 10{sup 9} to 1 Multiplication-Sign 10{sup 10}cm{sup -3} when the discharge gas pressure increased from 5 to 10 mTorr. The electron microscope images show that the grain size of Zn thin film increase when the discharge power is increased. This may be due to the enhancement of plasma density and sputtered Zn density.

Hard coatings on magnesium alloys by sputter deposition using a pulsed d.c. bias voltage

Energy Technology Data Exchange (ETDEWEB)

Reiners, G. [Bundesanstalt fuer Materialforschung und -pruefung, Berlin (Germany); Griepentrog, M. [Bundesanstalt fuer Materialforschung und -pruefung, Berlin (Germany)

1995-12-01

An increasing use of magnesium-based light-metal alloys for various industrial applications was predicted in different technological studies. Companies in different branches have developed machine parts made of magnesium alloys (e.g. cars, car engines, sewing and knitting machines). Hence, this work was started to evaluate the ability of hard coatings obtained by physical vapour deposition (PVD) in combination with coatings obtained by electrochemical deposition to protect magnesium alloys against wear and corrosion. TiN hard coatings were deposited onto magnesium alloys by unbalanced magnetron sputter deposition. A bipolar pulsed d.c. bias voltage was used to limit substrate temperatures to 180 C during deposition without considerable loss of microhardness and adhesion. Adhesion, hardness and load-carrying capacity of TiN coatings deposited directly onto magnesium alloys are compared with the corresponding values of TiN coatings deposited onto substrates which had been coated electroless with an Ni-P alloy interlayer prior to the PVD. (orig.)

Indium zinc oxide films deposited on PET by LF magnetron sputtering

International Nuclear Information System (INIS)

Kim, Eun Lyoung; Jung, Sang Kooun; Sohn, Sang Ho; Park, Duck Kyu

2007-01-01

Indium zinc oxide (IZO) has attracted much attention recently for use in transparent oxide films compared with the ITO film. We carried out the deposition of IZO on a polyethylene terapthalate (PET) substrate at room temperature by a low-frequency (LF) magnetron sputtering system. These films have amorphous structures with excellent electrical stability, surface uniformity and high optical transmittance. The effects of LF applied voltage and O 2 flow rate were investigated. The electrical and optical properties were studied. At optimal deposition conditions, thin films of IZO with a sheet resistance of 32 Ω/sq and an optical transmittance of over 80% in the visible spectrum range were achieved. The IZO thin films fabricated by this method do not require substrate heating during the film preparation of any additional post-deposition annealing treatment. The experimental results show that films with good qualities of surface morphology, transmittance and electrical conduction can be grown by the LF magnetron sputtering method on PET which is recommendable

Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) yields better Hydrolytical Stability of Biocompatible SiOx Thin Films on Implant Alumina Ceramics compared to Rapid Thermal Evaporation Physical Vapor Deposition (PVD).

Science.gov (United States)

Böke, Frederik; Giner, Ignacio; Keller, Adrian; Grundmeier, Guido; Fischer, Horst

2016-07-20

Densely sintered aluminum oxide (α-Al2O3) is chemically and biologically inert. To improve the interaction with biomolecules and cells, its surface has to be modified prior to use in biomedical applications. In this study, we compared two deposition techniques for adhesion promoting SiOx films to facilitate the coupling of stable organosilane monolayers on monolithic α-alumina; physical vapor deposition (PVD) by thermal evaporation and plasma enhanced chemical vapor deposition (PE-CVD). We also investigated the influence of etching on the formation of silanol surface groups using hydrogen peroxide and sulfuric acid solutions. The film characteristics, that is, surface morphology and surface chemistry, as well as the film stability and its adhesion properties under accelerated aging conditions were characterized by means of X-ray photoelectron spectroscopy (XPS), energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy (SEM), inductively coupled plasma-optical emission spectroscopy (ICP-OES), and tensile strength tests. Differences in surface functionalization were investigated via two model organosilanes as well as the cell-cytotoxicity and viability on murine fibroblasts and human mesenchymal stromal cells (hMSC). We found that both SiOx interfaces did not affect the cell viability of both cell types. No significant differences between both films with regard to their interfacial tensile strength were detected, although failure mode analyses revealed a higher interfacial stability of the PE-CVD films compared to the PVD films. Twenty-eight day exposure to simulated body fluid (SBF) at 37 °C revealed a partial delamination of the thermally deposited PVD films whereas the PE-CVD films stayed largely intact. SiOx layers deposited by both PVD and PE-CVD may thus serve as viable adhesion-promoters for subsequent organosilane coupling agent binding to α-alumina. However, PE-CVD appears to be favorable for long-term direct film exposure to aqueous

Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering

International Nuclear Information System (INIS)

Olaya, J.J.; Rodil, S.E.; Muhl, S.

2008-01-01

Niobium nitride (NbN) coatings have many interesting properties such as chemical inertness, excellent mechanical properties, high electrical conductivity, high melting point, and a superconducting transition temperature between 16 and 17 K. For this reason, these compounds have many potential thin film applications. In this work we compare the properties of NbN x films deposited using well-characterized balanced and unbalanced magnetron sputtering systems. Samples of NbN were deposited in the two systems under almost identical deposition conditions, that is, the same substrate temperature, plasma power, gas pressure, substrate to target distance and Ar/N 2 ratio. Prior to the film preparation both the magnetic field geometry and the characteristics of the plasma were determined. The microstructure and composition of the deposits were analyzed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. The corrosion resistance and the micro-abrasion wear resistance were measured by anodic polarization potentiodynamic studies and by ball cratering, respectively. The NbN films grown using the highly unbalanced magnetron configuration had a preferential (111) crystal orientation and a composite hardness of up to 2400 HV 0.025 . While the films deposited using the balanced magnetron had a mixed crystalline orientation and a hardness of 2000 HV 0.025 . The results demonstrate the strong effect of magnetic field configuration on the ion bombardment, and the resultant coating characteristics

Comparative study of niobium nitride coatings deposited by unbalanced and balanced magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Bogota Colombia (Colombia); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico); Muhl, S. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Mexico D. F. 04510 (Mexico)], E-mail: muhl@servidor.unam.mx

2008-10-01

Niobium nitride (NbN) coatings have many interesting properties such as chemical inertness, excellent mechanical properties, high electrical conductivity, high melting point, and a superconducting transition temperature between 16 and 17 K. For this reason, these compounds have many potential thin film applications. In this work we compare the properties of NbN{sub x} films deposited using well-characterized balanced and unbalanced magnetron sputtering systems. Samples of NbN were deposited in the two systems under almost identical deposition conditions, that is, the same substrate temperature, plasma power, gas pressure, substrate to target distance and Ar/N{sub 2} ratio. Prior to the film preparation both the magnetic field geometry and the characteristics of the plasma were determined. The microstructure and composition of the deposits were analyzed by X-ray diffraction, scanning electron microscopy and X-ray photoelectron spectroscopy. The corrosion resistance and the micro-abrasion wear resistance were measured by anodic polarization potentiodynamic studies and by ball cratering, respectively. The NbN films grown using the highly unbalanced magnetron configuration had a preferential (111) crystal orientation and a composite hardness of up to 2400 HV{sub 0.025}. While the films deposited using the balanced magnetron had a mixed crystalline orientation and a hardness of 2000 HV{sub 0.025}. The results demonstrate the strong effect of magnetic field configuration on the ion bombardment, and the resultant coating characteristics.

[Effects of magnetron sputtered ZrN on the bonding strength of titanium porcelain].

Science.gov (United States)

Zhou, Shu; Zhang, Wen-yan; Guang, Han-bing; Xia, Yang; Zhang, Fei-min

2009-04-01

To investigate the effect of magnetron sputtered ZrN on the bonding strength between a low-fusing porcelain (Ti/Vita titankeramik system) and commercially pure cast titanium. Sixteen specimens were randomly assigned to test group and control group (n=8). The control group received no surface treated. Magnetron sputtered ZrN film was deposited on the surface of specimens in the test group. Then the sixteen titanium-porcelain specimens were prepared in a rectangular shape and went through three-point bending test on a universal test machine. The bond strength of Ti/porcelain was recorded. The phase composition of the specimens was analyzed using X-ray diffraction (XRD). The interface at titanium and porcelain and the titanium surface after debonding were observed with a scanning electron microscopy (SEM) and analyzed using energy depressive spectrum (EDS). New phase of ZrN was found with XRD in the test group. Statistical analysis showed higher bond strength following ZrN surface treatment in the test group [(45.991+/-0.648) MPa] than that in the control group [(29.483+/-1.007) MPa] (P=0.000). Bonded ceramic could be observed in test group, the amount of bonded ceramic was more than that in the control group. No obvious bonded ceramic in control group was found. Magnetron sputtered ZrN can improve bond strength of Ti/Vita titankeramik system significantly.

Characterization and evaluation of EB-PVD thermal barrier coatings by impedance spectroscopy

Energy Technology Data Exchange (ETDEWEB)

Zhang Chunxia; Liu Fushun; Gong Shengkai; Xu Huibin [School of Materials Science and Engineering, Beihang Univ., Beijing, BJ (China)

2005-07-01

Two layer thermal barrier coatings (TBCs) were prepared by EB-PVD (electron beam-physical vapor deposition) at different substrate temperatures in the range of 823 to 1123 K, and their microstructure was investigated with SEM and AC impedance as a function of substrate temperature and thermal cycling time. YSZ layer of all TBCs samples is in column structure, but the grain size and growth orientation are different with substrate. In this research, impedance spectra (IS) was measured as a function of thermal cycling between 1323 K and 298 K for these thermal barrier coatings. Grain boundary and bulk can be distinguished from analysis of AC impedance spectroa to provide information about the relation between microstructure and electric properties. The change in IS until failure was found to be related with the thickness, microcracks and macrocracks of TGO and the change in the interfacial of TGO/YSZ. (orig.)

Superhard PVD carbon films deposited with different gradients with and without additions of titanium and silicon

International Nuclear Information System (INIS)

Bauer, C.

2003-10-01

This work focusses on thin carbon-based films, deposited by magnetron sputtering with additional argon ion bombardment (0 eV to 800 eV) without extra adhesive layer on hard metal inserts. As one possibility of increasing the reduced adherence of hard carbon films the deposition of films with additions of titanium and silicon is studied. The aim of this work is to examine the influence of a modification of the transition between substrate and film by realizing three different types of deposition gradients. The pure carbon films are amorphous, the dominant network of atoms is formed by sp 2 bonded atoms. The amount of sp 3 bonded atoms is up to 30% and is influenced by the bombarding argon ion energy. Carbon films with additions of silicon are amorphous, only in films with a high amount of titanium (approx. 20 at%) nanocomposites of titanium carbide crystals with diameters of less than 5 nm in an amorphous carbon matrix were found. The mechanical properties and the behavior of single layer carbon films strongly depend on the argon ion energy. An increase of this energy leads to higher film hardness and higher residual stress and results in the delamination of superhard carbon films on hard metal substrates. The adhesion of single layer films for ion energies of more than 200 eV is significantly improved by additions of titanium and silicon, respectively. The addition of 23 at% silicon and titanium, respectively leads to a high reduction of the residual stress. In a non-reactive PVD process thin films were deposited with a continuously gradient in chemical composition. The results of the investigations of the films with two different concentrations of titanium and silicon, respectively show that carbon-based films with a good adhesion could be deposited. The combination of the two gradients in structure and properties and in chemical composition leads in the system with carbon and silicon carbide to hard and very adhesive films. Especially for carbon films with a high

Investigations on PVdF- HFP - PEMA polymer blend electrolytes doped with different lithium salts

Science.gov (United States)

Manojkumar Ubarhande, Radha; Bhattacharya, Shreya; Usha Rani, M.; Shanker Babu, Ravi; Krishnaveni, S.

2017-11-01

Plasticized polymer blend electrolytes were prepared by incorporating poly (vinylidenefluoride-co-hexafluoropropylene)(PVdF-HFP) and poly(ethylmethacrylate) (PEMA) complexed with plasticizer (PC) and different lithium salts such as LiClO4, LiBF4, LiCF3SO3 and LiN (CF3SO2)2) using solution-casting technique. X-ray diffraction and Fourier transform infra-red techniques confirms the structural characters and complex formation of the polymer electrolytes respectively. AC impedance analysis was carried out for all the samples in the range303-373K. The results suggest that among the various lithium salts, LiN (CF3SO2)2) based electrolytes exhibited the highest ionic conductivity (3.17 × 10-3 Scm-1).

Tribological and Wear Performance of Nanocomposite PVD Hard Coatings Deposited on Aluminum Die Casting Tool

Directory of Open Access Journals (Sweden)

Jose Mario Paiva

2018-02-01

Full Text Available In the aluminum die casting process, erosion, corrosion, soldering, and die sticking have a significant influence on tool life and product quality. A number of coatings such as TiN, CrN, and (Cr,AlN deposited by physical vapor deposition (PVD have been employed to act as protective coatings due to their high hardness and chemical stability. In this study, the wear performance of two nanocomposite AlTiN and AlCrN coatings with different structures were evaluated. These coatings were deposited on aluminum die casting mold tool substrates (AISI H13 hot work steel by PVD using pulsed cathodic arc evaporation, equipped with three lateral arc-rotating cathodes (LARC and one central rotating cathode (CERC. The research was performed in two stages: in the first stage, the outlined coatings were characterized regarding their chemical composition, morphology, and structure using glow discharge optical emission spectroscopy (GDOES, scanning electron microscopy (SEM, and X-ray diffraction (XRD, respectively. Surface morphology and mechanical properties were evaluated by atomic force microscopy (AFM and nanoindentation. The coating adhesion was studied using Mersedes test and scratch testing. During the second stage, industrial tests were carried out for coated die casting molds. In parallel, tribological tests were also performed in order to determine if a correlation between laboratory and industrial tests can be drawn. All of the results were compared with a benchmark monolayer AlCrN coating. The data obtained show that the best performance was achieved for the AlCrN/Si3N4 nanocomposite coating that displays an optimum combination of hardness, adhesion, soldering behavior, oxidation resistance, and stress state. These characteristics are essential for improving the die mold service life. Therefore, this coating emerges as a novelty to be used to protect aluminum die casting molds.

Tribological and Wear Performance of Nanocomposite PVD Hard Coatings Deposited on Aluminum Die Casting Tool.

Science.gov (United States)

Paiva, Jose Mario; Fox-Rabinovich, German; Locks Junior, Edinei; Stolf, Pietro; Seid Ahmed, Yassmin; Matos Martins, Marcelo; Bork, Carlos; Veldhuis, Stephen

2018-02-28

In the aluminum die casting process, erosion, corrosion, soldering, and die sticking have a significant influence on tool life and product quality. A number of coatings such as TiN, CrN, and (Cr,Al)N deposited by physical vapor deposition (PVD) have been employed to act as protective coatings due to their high hardness and chemical stability. In this study, the wear performance of two nanocomposite AlTiN and AlCrN coatings with different structures were evaluated. These coatings were deposited on aluminum die casting mold tool substrates (AISI H13 hot work steel) by PVD using pulsed cathodic arc evaporation, equipped with three lateral arc-rotating cathodes (LARC) and one central rotating cathode (CERC). The research was performed in two stages: in the first stage, the outlined coatings were characterized regarding their chemical composition, morphology, and structure using glow discharge optical emission spectroscopy (GDOES), scanning electron microscopy (SEM), and X-ray diffraction (XRD), respectively. Surface morphology and mechanical properties were evaluated by atomic force microscopy (AFM) and nanoindentation. The coating adhesion was studied using Mersedes test and scratch testing. During the second stage, industrial tests were carried out for coated die casting molds. In parallel, tribological tests were also performed in order to determine if a correlation between laboratory and industrial tests can be drawn. All of the results were compared with a benchmark monolayer AlCrN coating. The data obtained show that the best performance was achieved for the AlCrN/Si₃N₄ nanocomposite coating that displays an optimum combination of hardness, adhesion, soldering behavior, oxidation resistance, and stress state. These characteristics are essential for improving the die mold service life. Therefore, this coating emerges as a novelty to be used to protect aluminum die casting molds.

Rotating dust ring in an RF discharge coupled with a dc-magnetron sputter source. Experiment and simulation

International Nuclear Information System (INIS)

Matyash, K; Froehlich, M; Kersten, H; Thieme, G; Schneider, R; Hannemann, M; Hippler, R

2004-01-01

During an experiment involving coating of dust grains trapped in an RF discharge using a sputtering dc-magnetron source, a rotating dust ring was observed and investigated. After the magnetron was switched on, the dust cloud levitating above the RF electrode formed a ring rotating as a rigid body. Langmuir probe diagnostics were used for the measurement of plasma density and potential. It was discovered that the coupling of the dc-magnetron source to the RF discharge causes steep radial gradients in electron density and plasma potential. The rotation of the dust ring is attributed to the azimuthal component of the ion drag force, which appears due to the azimuthal drift of the ions caused by crossed radial electric and axial magnetic fields. In order to get more insight into the mechanism of dust ring rotation, a Particle-in-Cell simulation of a rotating dust cloud was performed. The results of the experiment and simulation are presented and discussed

Rotating dust ring in an RF discharge coupled with a dc-magnetron sputter source. Experiment and simulation

Energy Technology Data Exchange (ETDEWEB)

Matyash, K [Institut fuer Niedertemperaturplasmaphysik Greifswald, Fr.-L.-Jahn-Strasse 19, 17489 Greifswald (Germany); Froehlich, M [Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Domstrasse 10a, 17487 Greifswald (Germany); Kersten, H [Institut fuer Niedertemperaturplasmaphysik Greifswald, Fr.-L.-Jahn-Strasse 19, 17489 Greifswald (Germany); Thieme, G [Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Domstrasse 10a, 17487 Greifswald (Germany); Schneider, R [Max-Planck-Institut fuer Plasmaphysik, Teilinstitut Greifswald, Wendelsteinstrasse 1, 17489 Greifswald (Germany); Hannemann, M [Institut fuer Niedertemperaturplasmaphysik Greifswald, Fr.-L.-Jahn-Strasse 19, 17489 Greifswald (Germany); Hippler, R [Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Domstrasse 10a, 17487 Greifswald (Germany)

2004-10-07

During an experiment involving coating of dust grains trapped in an RF discharge using a sputtering dc-magnetron source, a rotating dust ring was observed and investigated. After the magnetron was switched on, the dust cloud levitating above the RF electrode formed a ring rotating as a rigid body. Langmuir probe diagnostics were used for the measurement of plasma density and potential. It was discovered that the coupling of the dc-magnetron source to the RF discharge causes steep radial gradients in electron density and plasma potential. The rotation of the dust ring is attributed to the azimuthal component of the ion drag force, which appears due to the azimuthal drift of the ions caused by crossed radial electric and axial magnetic fields. In order to get more insight into the mechanism of dust ring rotation, a Particle-in-Cell simulation of a rotating dust cloud was performed. The results of the experiment and simulation are presented and discussed.

Increase in the accuracy of approximating the profile of the erosion zone in planar magnetrons

Science.gov (United States)

Rogov, A. V.; Kapustin, Yu. V.

2017-09-01

It has been shown that the use of the survival function of the Weibull distribution shifted along the ordinate axis allows one to increase the accuracy of the approximation of the normalized profile of an erosion zone in the area from the axis to the maximum sputtering region compared with the previously suggested distribution function of the extremum values. The survival function of the Weibull distribution is used in the area from the maximum to the outer boundary of an erosion zone. The major advantage of using the new approximation is observed for magnetrons with a large central nonsputtered spot and for magnetrons with substantial sputtering in the paraxial zone.

Properties of RF magnetron sputtered gallium nitride semiconductors doped with erbium

Czech Academy of Sciences Publication Activity Database

Peřina, Vratislav; Macková, Anna; Hnatowicz, Vladimír; Prajzler, V.; Machovič, V.; Matějka, P.; Schröfel, J.

2004-01-01

Roč. 36, č. 8 (2004), s. 952-954 ISSN 0142-2421 R&D Projects: GA ČR GA104/03/0387 Institutional research plan: CEZ:AV0Z1048901 Keywords : Er-doped GaN * luminescence * magnetron sputtering Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 1.209, year: 2004

DUAL TIMELIKE NORMAL AND DUAL TIMELIKE SPHERICAL CURVES IN DUAL MINKOWSKI SPACE

OpenAIRE

ÖNDER, Mehmet

2009-01-01

Abstract: In this paper, we give characterizations of dual timelike normal and dual timelike spherical curves in the dual Minkowski 3-space and we show that every dual timelike normal curve is also a dual timelike spherical curve. Keywords: Normal curves, Dual Minkowski 3-Space, Dual Timelike curves. Mathematics Subject Classifications (2000): 53C50, 53C40. DUAL MINKOWSKI UZAYINDA DUAL TIMELIKE NORMAL VE DUAL TIMELIKE KÜRESEL EĞRİLER Özet: Bu çalışmada, dual Minkowski 3-...

Mechanical properties of EB-PVD ZrO{sub 2} thermal barrier coatings; Mechanische Eigenschaften von EB-PVD ZrO{sub 2} Waermedaemmschichten

Energy Technology Data Exchange (ETDEWEB)

Held, Carolin

2014-08-29

In this work, the elastic properties of thermal barrier coatings which were produced by electron-beam enhanced physical vapour deposition were investigated, as well as the dependency of the properties on the sample microstructure, the thermal treatment and the test method. For this purpose, not only commercial coatings were characterized, but also special sample material was used which consists of a 1 mm thick layer of EB-PVD TBC. This material was isothermally heat treated for different times at 950 C, 1100 C and 1200 C and then tested in a specially developed miniaturized bend test and by dynamic mechanical analysis. The sample material was tested by nanoindentation in order to measure the Young's modulus on a local scale, and the porosity of the samples was determined by microstructure analysis and porosimetry. The decrease of porosity could be connected with sintering and subsequent stiffening of the material. The test results are dependent on the tested volume. A small test volume leads to larger measured Young's moduli, while a large test volume yields lower values. The test volume also has an influence on the increase of stiffness during thermal exposure. With a small tested volume, a quicker increase of the Young's modulus was registered, which could be associated to the sintering of local structures.

Structure and functionality of PVdF/PAN based, composite proton conducting membranes

International Nuclear Information System (INIS)

Martinelli, A.; Navarra, M.A.; Matic, A.; Panero, S.; Jacobsson, P.; Boerjesson, L.; Scrosati, B.

2005-01-01

We have investigated new poly-vinylidene fluoride/poly-acrylonitrile (PVdF/PAN) based proton conducting membranes by means of vibrational spectroscopy. We find that a complete phase inversion occurs during the preparation procedure, when the gelling solvents are replaced by an acidic solution, providing the proton conducting property. The uptake of acid is promoted both by the presence of PAN and the ceramic filler, Al 2 O 3 . No particular interaction between the polymer matrix and the acidic solution could be detected, supporting the picture of an inert matrix entrapping a liquid component. However, the dissociation degree of the acid is decreased due to the spatial confinement in the membrane. By comparing the dissociation degree and the actual amount of acid in the membrane to the conductivity, we conclude that the limiting factor for the conductivity is the long-range mobility of the protons, which is governed by the morphology of the membrane

Enhanced Corrosion Resistance of PVD-CrN Coatings by ALD Sealing Layers

Science.gov (United States)

Wan; Zhang, Teng Fei; Ding, Ji Cheng; Kim, Chang-Min; Park, So-Won; Yang, Yang; Kim, Kwang-Ho; Kwon, Se-Hun

2017-04-01

Multilayered hard coatings with a CrN matrix and an Al2O3, TiO2, or nanolaminate-Al2O3/TiO2 sealing layer were designed by a hybrid deposition process combined with physical vapor deposition (PVD) and atomic layer deposition (ALD). The strategy was to utilize ALD thin films as pinhole-free barriers to seal the intrinsic defects to protect the CrN matrix. The influences of the different sealing layers added in the coatings on the microstructure, surface roughness, and corrosion behaviors were investigated. The results indicated that the sealing layer added by ALD significantly decreased the average grain size and improved the corrosion resistance of the CrN coatings. The insertion of the nanolaminate-Al2O3/TiO2 sealing layers resulted in a further increase in corrosion resistance, which was attributed to the synergistic effect of Al2O3 and TiO2, both acting as excellent passivation barriers to the diffusion of corrosive substances.

Implementation of Design Changes Towards a More Reliable, Hands-off Magnetron Ion Source

Energy Technology Data Exchange (ETDEWEB)

Sosa, A. [Fermilab; Bollinger, D. S. [Fermilab; Karns, P. R. [Fermilab; Tan, C. Y. [Fermilab

2017-12-07

As the main H- ion source for the accelerator complex, magnetron ion sources have been used at Fermilab since the 1970’s. At the offline test stand, new R&D is carried out to develop and upgrade the present magnetron-type sources of H- ions of up to 80 mA and 35 keV beam energy in the context of the Proton Improvement Plan. The aim of this plan is to provide high-power proton beams for the experiments at FNAL. In order to reduce the amount of tuning and monitoring of these ion sources, a new electronic system consisting of a current-regulated arc discharge modulator allow the ion source to run at a constant arc current for improved beam output and operation. A solenoid-type gas valve feeds H2 gas into the source precisely and independently of ambient temperature. This summary will cover several studies and design changes that have been tested and will eventually be implemented on the operational magnetron sources at Fermilab. Innovative results for this type of ion source include cathode geometries, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction, with the aim to improve source lifetime, stability, and reducing the amount of tuning needed. In this summary, I will highlight the advances made in ion sources at Fermilab and will outline the directions of the continuing R&D effort.

CrN thin films prepared by reactive DC magnetron sputtering for symmetric supercapacitors

KAUST Repository

Wei, Binbin; Liang, Hanfeng; Zhang, Dongfang; Wu, Zhengtao; Qi, Zhengbing; Wang, Zhoucheng

2016-01-01

stability are promising candidates as supercapacitor electrode materials. In this work, we report the fabrication of CrN thin films using reactive DC magnetron sputtering and further their applications for symmetric supercapacitors for the first time. The Cr

Comparative analysis of electrophysical properties of ceramic tantalum pentoxide coatings, deposited by electron beam evaporation and magnetron sputtering methods

Science.gov (United States)

Donkov, N.; Mateev, E.; Safonov, V.; Zykova, A.; Yakovin, S.; Kolesnikov, D.; Sudzhanskaya, I.; Goncharov, I.; Georgieva, V.

2014-12-01

Ta2O5 ceramic coatings have been deposited on glass substrates by e-beam evaporation and magnetron sputtering methods. For the magnetron sputtering process Ta target was used. X-ray diffraction measurements show that these coatings are amorphous. XPS survey spectra of the ceramic Ta2O5 coatings were obtained. All spectra consist of well-defined XPS lines of Ta 4f, 4d, 4p and 4s; O 1s; C 1s. Ta 4f doublets are typical for Ta2O5 coatings with two main peaks. Scanning electron microscopy and atomic force microscopy images of the e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have revealed a relatively flat surface with no cracks. The dielectric properties of the tantalum pentoxide coatings have been investigated in the frequency range of 100 Hz to 1 MHz. The electrical behaviour of e-beam evaporated and magnetron sputtered Ta2O5 ceramic coatings have also been compared. The deposition process conditions principally effect the structure parameters and electrical properties of Ta2O5 ceramic coatings. The coatings deposited by different methods demonstrate the range of dielectric parameters due to the structural and stoichiometric composition changes

Pd-catalysts for DFAFC prepared by magnetron sputtering

Czech Academy of Sciences Publication Activity Database

Bieloshapka, Igor; Jiříček, Petr; Vorokhta, M.; Tomšík, Elena; Rednyk, A.; Perekrestov, R.; Jurek, Karel; Ukraintsev, Egor; Hruška, Karel; Romanyuk, Olexandr; Lesiak, B.

2017-01-01

Roč. 419, Oct (2017), s. 838-846 ISSN 0169-4332 R&D Projects: GA ČR(CZ) GBP108/12/G108; GA MŠk LM2015088 Institutional support: RVO:68378271 ; RVO:61389013 Keywords : Pd catalyst * formic acid fuel cell * magnetron sputtering * DFAFC * surface morphology Subject RIV: BM - Solid Matter Physics ; Magnetism; BM - Solid Matter Physics ; Magnetism (UMCH-V) OBOR OECD: Condensed matter physics (including formerly solid state physics, supercond.); Condensed matter physics (including formerly solid state physics, supercond.) (UMCH-V) Impact factor: 3.387, year: 2016

Tribological properties of anti-wear PVD coatings for elevated temperatures application deposited onto X37CrMoV5-1 type hot work steel

International Nuclear Information System (INIS)

Dobrzanski, L.A.; Polok, M.; Adamiak, M.

2003-01-01

The paper presents results of tribological and adhesion investigations of anti-wear PVD coatings TiN, TiN/(Ti,Al)N and CrN types deposited in ion plating PVD process onto X37CrMoV5-1 type hot work tool steel. It was found that damage mechanism during scratch test in all investigated coatings begins with multiple spallings located on the scratch edges followed by cracking and tool coatings delamination. Regarding to the coating types it can be seen different location of such damages and loads typical for them. According to this observations it can be stated that highest adhesion among investigated coating present, CrN monolayer coating and the lowest one multilayers Ti/(Ti,Al)N coating. The wear resistance was investigated by pin-on-disc method performed in room and elevated to 500 o C temperatures. It was found that the lowest wear in to fixed investigation conditions in both room and elevated temperatures shows TiN monolayer coating. Additionally one can see that TiN coatings application improve wear resistance some five times. (author)

Magnetron sputtering system with an annual discharge zone and two cathode modules

International Nuclear Information System (INIS)

Savich, V. A.; Yasyunas, A. A.; Kovrigo, V. M.; Kotov, D. A.; Shiripov, V. Ya.

2013-01-01

In this article, general discharge characteristics of a cylindrical magnetron sputtering system with an annual sputtering zone and a high target usage coefficient designed for transparent conducting coatings are shown. Two coupled DC-cathodes are used to improve coating uniformity. Radial sputtered material fluxes are being created. The engineered magnetic system is extremely balanced (G-factor is much higher than 2) and thus provides maximal effective operating power higher than 6 kW. The effectiveness of a magnetic trap results in a fast work cycle (less than 1.5 min) and a high target material usage coefficient (higher than 40%). A multipole magnetic field with null magnetic flux density zones lower target’s surface is being created. There is an influence between cathode modules despite mutual magnetic isolation, so magnetic conductors-shunts are used to weaken it. The magnetron can be used to sputter both metals and conducting ceramics (including ITO). (authors)

Contribution to crystallographical and mechanical analysis of molybdenum coatings prepared by magnetron cathode sputtering

International Nuclear Information System (INIS)

Bosland, P.

1989-07-01

Molybdenum coatings with different compression stresses are obtained by magnetron cathode sputtering by varying negative voltage applied to the substrate during deposition. Stress evolution, crystal texture and argon content are studied [fr

CrCuAgN PVD nanocomposite coatings: Effects of annealing on coating morphology and nanostructure

Energy Technology Data Exchange (ETDEWEB)

Liu, Xingguang, E-mail: xingguangliu1@gmail.com [Department of Materials Science and Engineering, Sir Robert Hadfield Building, The University of Sheffield, Mappin Street, Sheffield, S1 3JD (United Kingdom); Iamvasant, Chanon, E-mail: ciamvasant1@sheffield.ac.uk [Department of Materials Science and Engineering, Sir Robert Hadfield Building, The University of Sheffield, Mappin Street, Sheffield, S1 3JD (United Kingdom); Liu, Chang, E-mail: chang.liu@sheffield.ac.uk [Department of Materials Science and Engineering, Sir Robert Hadfield Building, The University of Sheffield, Mappin Street, Sheffield, S1 3JD (United Kingdom); Matthews, Allan, E-mail: allan.matthews@manchester.ac.uk [Pariser Building - B24 ICAM, School of Materials, The University of Manchester, Manchester, M13 9PL (United Kingdom); Leyland, Adrian, E-mail: a.leyland@sheffield.ac.uk [Department of Materials Science and Engineering, Sir Robert Hadfield Building, The University of Sheffield, Mappin Street, Sheffield, S1 3JD (United Kingdom)

2017-01-15

Highlights: • Coatings with nitrogen content up to 16 at.% exhibit a metallic Cr solid solution, even after post-coat annealing at 300 °C and 500 °C. • At higher N/Cr atomic ratios (approaching Cr{sub 2}N stoichiometry), chromium was still inclined to exist in solid solution with nitrogen, rather than as a ceramic nitride phase, even after annealing at 500 °C. • Transportation of Cu and Ag to the surface depends on annealing temperature, annealing duration, nitrogen concentration and ‘global’ Cu + Ag concentration. • Incorporation of copper appears to be a powerful strategy to enhance Ag mobility at low concentration (∼3 at.% Ag in this study) under moderately high service temperature. • A significant decrease in friction coefficient was obtained at room temperature after annealing, or during sliding wear testing at elevated temperature. - Abstract: CrCuAgN PVD nanocomposite coatings were produced using pulsed DC unbalanced magnetron sputtering. This investigation focuses on the effects of post-coat annealing on the surface morphology, phase composition and nanostructure of such coatings. In coatings with nitrogen contents up to 16 at.%, chromium exists as metallic Cr with N in supersaturated solid solution, even after 300 °C and 500 °C post-coat annealing. Annealing at 300 °C did not obviously change the phase composition of both nitrogen-free and nitrogen-containing coatings; however, 500 °C annealing resulted in significant transformation of the nitrogen-containing coatings. The formation of Ag aggregates relates to the (Cu + Ag)/Cr atomic ratio (threshold around 0.2), whereas the formation of Cu aggregates relates to the (Cu + Ag + N)/Cr atomic ratio (threshold around 0.5). The primary annealing-induced changes were reduced solubility of Cu, Ag and N in Cr, and the composition altering from a mixed ultra-fine nanocrystalline and partly amorphous phase constitution to a coarser, but still largely nanocrystalline structure. It was also

RF magnetron sputtering and evaporation of polyisobutylene and low density polyethylene

Czech Academy of Sciences Publication Activity Database

Kousal, J.; Hanuš, J.; Choukourov, A.; Hlídek, P.; Biederman, H.; Slavinská, D.; Zemek, Josef

2005-01-01

Roč. 200, 1-4 (2005), s. 472-475 ISSN 0257-8972 R&D Projects: GA MŠk(CZ) OC 527.10; GA MŠk(CZ) ME 553 Institutional research plan: CEZ:AV0Z10100521 Keywords : magnetron * radio frequency * sputtering * polyethylene * polyisobutylene Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.646, year: 2005

Advanced TiC/a-C : H nanocomposite coatings deposited by magnetron sputtering

NARCIS (Netherlands)

Pei, Y.T.; Galvan, D.; Hosson, J.Th.M. De; Strondl, C.

2006-01-01

TiC/a-C:H nanocomposite coatings have been deposited by magnetron Sputtering. They consist of 2-5 nm TiC nanocrystallites embedded in the amorphous hydrocarbon (a-C:H) matrix. A transition from a Columnar to a glassy microstructure has been observed in the nanocomposite coatings with increasing

[Effect of niobium nitride on the bonding strength of titanium porcelain by magnetron sputtering].

Science.gov (United States)

Wang, Shu-shu; Zhang, La-bao; Guang, Han-bing; Zhou, Shu; Zhang, Fei-min

2010-05-01

To investigate the effect of magnetron sputtered niobium nitride (NbN) on the bonding strength of commercially pure cast titanium (Ti) and low-fusing porcelain (Ti/Vita titankeramik system). Sixty Ti specimens were randomly divided into four groups, group T1, T2, T3 and T4. All specimens of group T1 and T2 were first treated with 120 microm blasted Al2O3 particles, and then only specimens of group T2 were treated with magnetron sputtered NbN film. All specimens of group T3 and T4 were first treated with magnetron sputtered NbN film and then only specimens of group T4 were treated with 120 microm blasted Al2O3 particles. The composition of the deposits were analyzed by X-ray diffraction (XRD). A universal testing machine was used to perform the three-point bending test to evaluate the bonding strength of Ti and porcelain. The microstructure of NbN, the interface of Ti-porcelain and the fractured Ti surface were observed with scanning electron microscopy (SEM) and energy depressive spectrum (EDS), and the results were compared. The XRD results showed that the NbN deposits were cubic crystalline phases. The bonding strength of Ti and porcelain in T1 to T4 group were (27.2+/-0.8), (43.1+/-0.6), (31.4+/-1.0) and (44.9+/-0.6) MPa. These results were analyzed by one-way analysis of variance and differences between groups were compared using least significant difference test. Significant inter-group differences were found among all groups (Pporcelain, while samples treated with both Al2O3 and NbN had better bond. EDS of Ti-porcelain interface showed oxidation occurred in T1, T2 and T3, but was well controlled in T4. Magnetron sputtered NbN can prevent Ti from being oxidized, and can improve the bonding strength of Ti/Vita titankeramik system. Al2O3 blast can also improve the bonding strength of Ti/Vita titankeramik system.

ac impedance, DSC and FT-IR investigations on (x)PVAc-(1 - x)PVdF blends with LiClO4

International Nuclear Information System (INIS)

Baskaran, R.; Selvasekarapandian, S.; Kuwata, N.; Kawamura, J.; Hattori, T.

2006-01-01

The blended polymer electrolytes comprising poly(vinyl acetate) (PVAc)-poly(vinylidene fluoride) (PVdF) have been prepared for different blend composition with constant lithium perchlorate (LiClO 4 ) ratio by solution casting technique. The formation of the blend polymer electrolyte complex has been confirmed by FT-IR spectroscopy analysis. DSC analysis has been performed in order to observe the change in transition temperature that is caused by the blending of polymers and addition of LiClO 4 . The ac impedance and dielectric spectroscopy studies are carried out on the blended matrix to identify the optimized blend composition, which is having high ionic conductivity. The temperature dependence of conductivity of the polymer electrolytes is found to follow VTF type equation. The high ionic conductivity of 6.4 x 10 -4 S cm -1 at 343 K has been observed for blended polymer electrolyte having blend ratio 75:25 (PVAc:PVdF). The ionic transference number of mobile ions has been estimated by Wagner's polarization method and the value is reported to be t ion is 0.95-0.98 for all the blended samples. The modulus spectra reveal the non-Debye nature and distribution of relaxation times of the samples. The dielectric spectra show the low frequency dispersion, which implies the space charge effects arising from the electrodes

Studies of steered arc motion and macroparticle production in PVD processing

International Nuclear Information System (INIS)

Craven, A.L.

2000-03-01

During the past decade the production industry has constantly strived to improve performance and cut costs, this has been aided by the development of high performance tools. The advancement of these tools has been accomplished by the application of hard wearing, low friction, coatings. A key process in the production of such coatings is Physical Vapour Deposition (PVD). Interest in such thin films has led to much research effort, both academic and industrial, being devoted to the area. In order that these advancements in technology continue, research into the fundamental aspects of PVD is required. This thesis describes research and experimental studies which have been performed to study the effect of 'steering' an electric arc on various aspects of its behaviour. 'Steering' of the arc is achieved by applying external magnetic fields which allow the guidance of the path of the arc. Work by earlier authors has aimed to control the arc more fully. The research presented here is based of a novel electromagnetic three coil steering array of cylindrical geometry. With such coils it is possible to vary the field profiles to a greater degree than has been previously achieved, permitting a greater range of steering arrangements/fields to be applied. The research presented is divided into two distinct areas: Firstly a number of experiments were performed to assess the effectiveness of the new steering coils on the motion of the arc. A personal computer was used here along with new arc motion monitoring electronics. This enabled the simultaneous measurement of the orbital transit times and also the degree of travel perpendicular to the steered direction of motion of the arc, as it traversed the surface of the cathode. Such information was then used to produce values for standard deviation of the arc from its steered path, velocity of the arc and a diffusion constant related to the motion of the are. Such values then allowed evaluation of the stochastic model of arc motion

Full Scale Model Test of Consolidation Acceleration on Soft Soil deposition with Combination of Timber Pile and PVD (Hybrid Pile)

OpenAIRE

Sandyutama, Y.; Samang, L.; Imran, A. M.; Harianto4, T.

2015-01-01

This research aims to analyze the effect of composite pile-PVD (hybrid pile) as the reinforcement in embankment on soft soil by the means of numerical simulation and Full-Scale Trial Embankment. The first phase cunducted by numerical analysis and obtained 6-8 meters hybrid pile length effective. Full-Scale trial embankment. was installed hybrid pile of 6 m and preloading of 4,50 height. Full-scale tests were performed to investigate the performances of Hybrid pile reinforcement. This research...

Heat treatable indium tin oxide films deposited with high power pulse magnetron sputtering

International Nuclear Information System (INIS)

Horstmann, F.; Sittinger, V.; Szyszka, B.

2009-01-01

In this study, indium tin oxide (ITO) films were prepared by high power pulse magnetron sputtering [D. J. Christie, F. Tomasel, W. D. Sproul, D. C. Carter, J. Vac. Sci. Technol. A, 22 (2004) 1415. ] without substrate heating. The ITO films were deposited from a ceramic target at a deposition rate of approx. 5.5 nm*m/min kW. Afterwards, the ITO films were covered with a siliconoxynitride film sputtered from a silicon alloy target in order to prevent oxidation of the ITO film during annealing at 650 deg. C for 10 min in air. The optical and electrical properties as well as the texture and morphology of these films were investigated before and after annealing. Mechanical durability of the annealed films was evaluated at different test conditions. The results were compared with state-of-the art ITO films which were obtained at optimized direct current magnetron sputtering conditions

The microstructure and properties of titanium dioxide films synthesized by unbalanced magnetron sputtering

International Nuclear Information System (INIS)

Leng, Y.X.; Chen, J.Y.; Yang, P.; Sun, H.; Huang, N.

2007-01-01

In this work, titanium oxide films were deposited on Ti6Al4V and Si (1 0 0) by DC unbalanced magnetron sputtering method at different oxygen pressure. X-ray diffraction (XRD), microhardness tests, pin-on-disk wear experiments, surface contact angle tests and platelet adhesion investigation were conducted to evaluate the properties of the films. The corrosion behavior of titanium dioxide films was characterized by potentiodynamic polarization. The results showed that titanium oxide films deposited by unbalance magnetron sputtering were compact and could obviously enhance microhardness, wear resistance of titanium alloy substrate. Potentiodynamic polarization curves showed that Ti-6Al-4V deposited with titanium dioxide films had lower dissolution currents than that of the uncoated one. The results of in vitro hemocompatibility analyses indicated that the blood compatibility of the titanium dioxide films with bandgap 3.2 eV have better blood compatibility

The Explicit Determinations Of Dual Plane Curves And Dual Helices In Terms Of Its Dual Curvature And Dual Torsion

OpenAIRE

Lee Jae Won; Choi Jin Ho; Jin Dae Ho

2014-01-01

In this paper, we give the explicit determinations of dual plane curves, general dual helices and dual slant helices in terms of its dual curvature and dual torsion as a fundamental theory of dual curves in a dual 3-space

Effect of residual gas on structural, electrical and mechanical properties of niobium films deposited by magnetron sputtering deposition

Science.gov (United States)

Wang, Lanruo; Zhong, Yuan; Li, Jinjin; Cao, Wenhui; Zhong, Qing; Wang, Xueshen; Li, Xu

2018-04-01

Magnetron sputtering is an important method in the superconducting thin films deposition. The residual gas inside the vacuum chamber will directly affect the quality of the superconducting films. In this paper, niobium films are deposited by magnetron sputtering under different chamber residual gas conditions. The influence of baking and sputtering process on residual gas are studied as well. Surface morphology, electrical and mechanical properties of the films are analysed. The residual gas analysis result before the sputtering process could be regarded as a reference condition to achieve high quality superconducting thin films.

Heteroepitaxial Ge-on-Si by DC magnetron sputtering

Directory of Open Access Journals (Sweden)

Martin Steglich

2013-07-01

Full Text Available The growth of Ge on Si(100 by DC Magnetron Sputtering at various temperatures is studied by Spectroscopic Ellipsometry and Transmission Electron Microscopy. Smooth heteroepitaxial Ge films are prepared at relatively low temperatures of 380°C. Typical Stransky-Krastanov growth is observed at 410°C. At lower temperatures (320°C, films are essentially amorphous with isolated nanocrystallites at the Si-Ge interface. A minor oxygen contamination at the interface, developing after ex-situ oxide removal, is not seen to hinder epitaxy. Compensation of dislocation-induced acceptors in Ge by sputtering from n-doped targets is proposed.

Combined optical emission and resonant absorption diagnostics of an Ar-O{sub 2}-Ce-reactive magnetron sputtering discharge

Energy Technology Data Exchange (ETDEWEB)

El Mel, A.A. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Institut des Matériaux Jean Rouxel, Université de Nantes, CNRS, 2 rue de la Houssinière B.P. 32229, Nantes Cedex 3 44322 (France); Ershov, S. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Britun, N., E-mail: nikolay.britun@umons.ac.be [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Ricard, A. [Université de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, Toulouse Cedex 9 F-31062 (France); Konstantinidis, S. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Snyders, R. [Chimie des Interactions Plasma-Surface (ChIPS), Research Institute for Materials Science and Engineering, Université de Mons, Place du Parc 23, Mons B-7000 (Belgium); Materia Nova Research Center, Parc Initialis, Avenue Copernic 1, Mons B-7000 (Belgium)

2015-01-01

We report the results on combined optical characterization of Ar-O{sub 2}-Ce magnetron sputtering discharges by optical emission and resonant absorption spectroscopy. In this study, a DC magnetron sputtering system equipped with a movable planar magnetron source with a Ce target is used. The intensities of Ar, O, and Ce emission lines, as well as the absolute densities of Ar metastable and Ce ground state atoms are analyzed as a function of the distance from the magnetron target, applied DC power, O{sub 2} content, etc. The absolute number density of the Ar{sup m} is found to decrease exponentially as a function of the target-to-substrate distance. The rate of this decrease is dependent on the sputtering regime, which should be due to the different collisional quenching rates of Ar{sup m} by O{sub 2} molecules at different oxygen contents. Quantitatively, the absolute number density of Ar{sup m} is found to be equal to ≈ 3 × 10{sup 8} cm{sup −3} in the metallic, and ≈ 5 × 10{sup 7} cm{sup −3} in the oxidized regime of sputtering, whereas Ce ground state densities at the similar conditions are found to be few times lower. The absolute densities of species are consistent with the corresponding deposition rates, which decrease sharply during the transition from metallic to poisoned sputtering regime. - Highlights: • Optical emission and resonant absorption spectroscopy are employed to study Ar-O{sub 2}-Ce magnetron sputtering discharges. • The density of argon metastables is found to decrease exponentially when increasing the target-to-substrate distance. • The collision-quenching rates of Ar{sup m} by O{sub 2} molecules at different oxygen contents is demonstrated. • The deposition rates of cerium and cerium oxide thin films decrease sharply during the transition from the metallic to the poisoned sputtering regime.

Composite Ag/C:H:N films prepared by planar magnetron deposition

Energy Technology Data Exchange (ETDEWEB)

Hlidek, P. [Charles University, Faculty of Mathematics and Physics, Praha (Czech Republic)], E-mail: hlidek@karlov.mff.cuni.cz; Hanus, J.; Biederman, H.; Slavinska, D.; Pesicka, J. [Charles University, Faculty of Mathematics and Physics, Praha (Czech Republic)

2008-05-30

Composite Ag/C:H:N films were deposited by means of an unbalanced magnetron operated in a gas mixture of nitrogen and n-hexane. Composition of the films was controlled by electric power delivered to the magnetron and by ratio of nitrogen and n-hexane in the working gas mixture. The films were characterized using transmission electron microscopy, by the absorption spectra in visible and near infrared regions and by Fourier transform infrared spectroscopy. Immediately after film deposition and without breaking vacuum (in situ) corresponding vibration infrared spectra were scanned and their evolution during ageing of the films was monitored. Wettability as determined from water contact angle was improved with raising nitrogen contents, i.e. with increasing the electric power and the ratio of nitrogen/n-hexane in the working gas mixture. The increased wettability is likely caused by presence of NH{sub x} groups in Ag/C:H:N films. The incorporation of nitrogen effectively prevents the formation of carboxylate groups on the silver inclusions surfaces during the aging in the open air. In addition, the oxidation mechanism of the polymer matrix is modified.

Preparation and Characterization of FC Films Coated on PET Substrates by RF Magnetron Sputtering

Directory of Open Access Journals (Sweden)

Huang Mei-lin

2018-01-01

Full Text Available Fluorocarbon (FC films were prepared on polyethylene terephthalate (PET plates and PET fabrics respectively by a radiofrequency (RF magnetron sputtering technique using polytetrafluoroethylene (PTFE as a target. Scanning electron microscope and X-ray photoelectron spectroscopy were used to investigate the morphology, structure and composition of the obtained FC films. The hydrophobicity and uvioresistant properties of the FC film coated fabric were studied. The results show that the FC films were successfully deposited on the PET substrates by a RF magnetron sputtering. The deposited films are made up of four components -CF3, -CF2-, CF- and -C-. The proportions of the four components and surface morphologies of the deposited films vary with the sputtering conditions. Compared with the original fabric samples, the hydrophobicity of the FC film coated fabrics is quite good and improved significantly.

High-speed deposition of protective films of aluminium oxide by the method of reactive magnetron sputtering

International Nuclear Information System (INIS)

Bugaev, S.P.; Zakhrov, A.N.; Ladyzhenskii, O.P.; Sochugov, M.S.

2001-01-01

The high optical characteristics of aluminium films made them attractive for different functional and decorative applications. It is well-known that the corrosion resistance of alloying is determined by the presence of the oxide film on its surface, but on the aluminium films, deposited by vacuum methods, the resistance is extremely low resulting in the relatively rapid failure of the coating. At present, there is a large number of methods of depositing the films of aluminium oxide. In most cases, it is recommended to use reactive magnetron sputtering of an aluminium target in a magnetron spraying system (MSS) using direct current, on dispersion of the target of aluminium oxide in a high-frequency MSS

A novel DC Magnetron sputtering facility for space research and synchrotron radiation optics

DEFF Research Database (Denmark)

Hussain, A.M.; Christensen, Finn Erland; Pareschi, G.

1998-01-01

A new DC magnetron sputtering facility has been build up at the Danish Space Research Institute (DSRI), specially designed to enable uniform coatings of large area curved optics, such as Wolter-I mirror optics used in space telescopes and curved optics used in synchrotron radiation facilities...

Non-classical crystallization of thin films and nanostructures in CVD and PVD processes

CERN Document Server

Hwang, Nong Moon

2016-01-01

This book provides a comprehensive introduction to a recently-developed approach to the growth mechanism of thin films and nanostructures via chemical vapour deposition (CVD). Starting from the underlying principles of the low pressure synthesis of diamond films, it is shown that diamond growth occurs not by individual atoms but by charged nanoparticles. This newly-discovered growth mechanism turns out to be general to many CVD and some physical vapor deposition (PVD) processes. This non-classical crystallization is a new paradigm of crystal growth, with active research taking place on growth in solution, especially in biomineralization processes. Established understanding of the growth of thin films and nanostructures is based around processes involving individual atoms or molecules. According to the author’s research over the last two decades, however, the generation of charged gas phase nuclei is shown to be the rule rather than the exception in the CVD process, and charged gas phase nuclei are actively ...

Heating of polymer substrate by discharge plasma in radiofrequency magnetron sputtering deposition

International Nuclear Information System (INIS)

Sirghi, Lucel; Popa, Gheorghe; Hatanaka, Yoshinori

2006-01-01

The substrate used for the thin film deposition in a radiofrequency magnetron sputtering deposition system is heated by the deposition plasma. This may change drastically the surface properties of the polymer substrates. Deposition of titanium dioxide thin films on polymethyl methacrylate and polycarbonate substrates resulted in buckling of the substrate surfaces. This effect was evaluated by analysis of atomic force microscopy topography images of the deposited films. The amount of energy received by the substrate surface during the film deposition was determined by a thermal probe. Then, the results of the thermal probe measurements were used to compute the surface temperature of the polymer substrate. The computation revealed that the substrate surface temperature depends on the substrate thickness, discharge power and substrate holder temperature. For the case of the TiO 2 film depositions in the radiofrequency magnetron plasma, the computation indicated substrate surface temperature values under the polymer melting temperature. Therefore, the buckling of polymer substrate surface in the deposition plasma may not be regarded as a temperature driven surface instability, but more as an effect of argon ion bombardment

Growth, structure and stability of sputter-deposited MoS2 thin films

Directory of Open Access Journals (Sweden)

Reinhard Kaindl

2017-05-01

Full Text Available Molybdenum disulphide (MoS2 thin films have received increasing interest as device-active layers in low-dimensional electronics and also as novel catalysts in electrochemical processes such as the hydrogen evolution reaction (HER in electrochemical water splitting. For both types of applications, industrially scalable fabrication methods with good control over the MoS2 film properties are crucial. Here, we investigate scalable physical vapour deposition (PVD of MoS2 films by magnetron sputtering. MoS2 films with thicknesses from ≈10 to ≈1000 nm were deposited on SiO2/Si and reticulated vitreous carbon (RVC substrates. Samples deposited at room temperature (RT and at 400 °C were compared. The deposited MoS2 was characterized by macro- and microscopic X-ray, electron beam and light scattering, scanning and spectroscopic methods as well as electrical device characterization. We find that room-temperature-deposited MoS2 films are amorphous, of smooth surface morphology and easily degraded upon moderate laser-induced annealing in ambient conditions. In contrast, films deposited at 400 °C are nano-crystalline, show a nano-grained surface morphology and are comparatively stable against laser-induced degradation. Interestingly, results from electrical transport measurements indicate an unexpected metallic-like conduction character of the studied PVD MoS2 films, independent of deposition temperature. Possible reasons for these unusual electrical properties of our PVD MoS2 thin films are discussed. A potential application for such conductive nanostructured MoS2 films could be as catalytically active electrodes in (photo-electrocatalysis and initial electrochemical measurements suggest directions for future work on our PVD MoS2 films.

corrosion and wear resistant ternary Cr-C-N coatings deposited by the ARC PVD process for machining tools and machining parts

International Nuclear Information System (INIS)

Knotek, O.; Lugscheider, E.; Zimmermann, H.; Bobzin, K.

1997-01-01

With the deposition of PVD hard coatings on the tools applied in machining operations it is possible to achieve significant improvements in the performance and quality of the machining processes. Depending on the machined material and the operating principle, e.g. turning, milling or drilling, not only different machining parameters but also different coating materials are necessary. In interrupted cut machining of tempered steel, for example, the life time of Ti-C-N coated inserts is several times greater than the Ti-C-N coated ones. This is a result of the favourable thermophysical and tribological properties of Ti-N-C. The potential for tool protection by CrN coatings is a result of the high ductility and low internal stress of this coating materials. CrN films can be deposited with greater film thickness, still maintaining very good adhesion. This paper presents the development of new arc PVD coatings in the system Cr-C-N. Owing to the carbon content in the coating an increased hardness and a better wear behavior in comparison to CrN was expected. The effects of various carbon carrier gases on the coating properties were examined. The coating properties were investigated by mechanical tests. X-ray diffraction, SEM analysis and corrosion tests. Some of the coatings were tested in machining tests. The results of these tests are presented in this paper. (author)

Plasma analysis of different TiN PVD processes at various process parameters

International Nuclear Information System (INIS)

Strauss, G.N.; Schlichtherle, S.; Pulker, H.K.; Meyer, M.; Jehn, H.; Balzer, M.; Misiano, C.; Silipo, V.

2002-01-01

TiN coatings of some microns in thickness were deposited by different reactive plasma deposition technologies (Magnetron Sputtering Magnetically Assisted, Arc Source Ion Plating, Sputter Ion Plating Plasma Assisted) on various metal parts. The experiments were carried out in specially designed plants under variable vacuum and plasma conditions. The plasma properties of the different processes were investigated by mass spectrometry and the energy distribution of process relevant particles was additionally determined. The aim of this work was to find proper processes and conditions for a reliable low cost deposition of hard coatings at relatively high gas pressures. It was found that the magnetically forced and medium frequency pulsed biased dc magnetron sputter deposition variants, operating in the 10 -3 mbar gas pressure range, showed a relatively large amount of single and double charged positive ions with kinetic energies up to 55 and 95 eV, as consequence of the applied modifications. Cathodic arc deposition, in the same gas pressure range of 10 - 3 mbar, showed a very high number of such ions with energies up to more than 100 eV, depending on the value of the applied arc current. However, at constant distance between source and substrate the higher gas pressure increases also the number of energy reducing collisions of the coating-material vapour-species with the gas molecules. The arc source process, even when performed at high gas pressures of about 10 -1 mbar, showed a remarkable amount of ions with energies up to 75 eV resulting in high performance TiN films of quite proper 3D homogeneity. The arc source technique is able to increase film thickness uniformity up to 3 times with respect to the traditional coatings if the samples are mounted in a way that they do not influence each other. (nevyjel)

Test stand for magnetron H negative ion source at IPP-Nagoya

Energy Technology Data Exchange (ETDEWEB)

Okamura, H; Kuroda, T; Miyahara, A

1981-02-01

Test facilities for the development of magnetron H(-) ion source consists of the vacuum system, power supplies, diagnostic equipment, and their controlling electronics. Schematics are presented and relevant items described including sequence control, optical links, the charged pulse forming network, the extractor power supply, magnet power supply, temperature control of the cesium feeder, and the pulsed valve driver. Noise problems and diagnostics are also considered.

Magnetic properties of in-plane oriented barium hexaferrite thin films prepared by direct current magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Zhang, Xiaozhi; Yue, Zhenxing, E-mail: yuezhx@mail.tsinghua.edu.cn; Meng, Siqin; Yuan, Lixin [State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China)

2014-12-28

In-plane c-axis oriented Ba-hexaferrite (BaM) thin films were prepared on a-plane (112{sup ¯}0) sapphire (Al{sub 2}O{sub 3}) substrates by DC magnetron sputtering followed by ex-situ annealing. The DC magnetron sputtering was demonstrated to have obvious advantages over the traditionally used RF magnetron sputtering in sputtering rate and operation simplicity. The sputtering power had a remarkable influence on the Ba/Fe ratio, the hematite secondary phase, and the grain morphology of the as-prepared BaM films. Under 80 W of sputtering power, in-plane c-axis highly oriented BaM films were obtained. These films had strong magnetic anisotropy with high hysteresis loop squareness (M{sub r}/M{sub s} of 0.96) along the in-plane easy axis and low M{sub r}/M{sub s} of 0.03 along the in-plane hard axis. X-ray diffraction patterns and pole figures revealed that the oriented BaM films grew via an epitaxy-like growth process with the crystallographic relationship BaM (101{sup ¯}0)//α-Fe{sub 2}O{sub 3}(112{sup ¯}0)//Al{sub 2}O{sub 3}(112{sup ¯}0)

Enriquecimiento en Si mediante PVD de chapas magnéticas convencionales para aplicaciones a altas frecuencias

Directory of Open Access Journals (Sweden)

Molina Aldareguía, J.

2000-06-01

Full Text Available The present work deals with the viability of a method for Si enrichment of conventional Fe-3%Si sheets, by means of physical vapour deposition of Si at its surface and subsequent diffusion heating. The aim is to obtain magnetic sheets with a Si content of 6.5wt%, for they show higher resistivity and null magnetostriction, leading to lower energy losses and solving the noise problems at high frequencies. The PVD deposited films, with ~5 μm thickness, show good adhesion to the substrate. Concerning the heat treatment, there is a critical heating rate between 5 and 15°/min, above which delamination of the film is observed without formation of intermetallics at the interface. At 3°/min the conditions for the formation of intermetallics are given. Direct heating up to 800°C leads to the formation of a Fe3Si(α1 surface layer, which, being brittle, does not delaminate during the heating process. Subsequent heating up to temperatures around 1200°C allows the homogenisation of the sheet composition. There is evidence of Kirkendall effect in the diffusion couple Fe3Si(α1/Fe(α, due to the fact that the diffusion of Fe in Fe3Si(α1 is faster than the diffusion of Si in Fe(α.

El presente trabajo estudia la viabilidad de un método para enriquecer en Si chapas de Fe-3%Si convencionales, depositando Si en su superficie mediante PVD y sometiéndolas a un tratamiento térmico de difusión. Se trata de obtener chapas magnéticas con un contenido en Si de un 6,5% en peso, ya que éstas presentan mayor resistividad y magnetoestricción nula, reduciendo las pérdidas y solucionando los problemas de ruido a altas frecuencias. Las capas depositadas por PVD, de espesores ~5 μm, presentan buena adherencia al substrato. En cuanto al tratamiento térmico, se observa que hay una velocidad de calentamiento crítica entre 5 y 15°/min, por encima de la cual la película se despega sin llegarse a formar intermetálicos en la intercara. A 3°/min se dan las

High frequency pulse anodising of magnetron sputtered Al–Zr and Al–Ti Coatings

DEFF Research Database (Denmark)

Gudla, Visweswara Chakravarthy; Bordo, Kirill; Engberg, Sara

2016-01-01

High frequency pulse anodising of Al–Zr and Al–Ti coatings is studied as a surface finishing technique and compared to conventional decorative DC anodising. The Al–Zr and Al–Ti coatings were deposited using DC magnetron sputtering and were heat treated after deposition to generate a multiphase mi...

Investigation of photocatalytic activity of titanium dioxide deposited on metallic substrates by DC magnetron sputtering

DEFF Research Database (Denmark)

Daviðsdóttir, Svava; Canulescu, Stela; Dirscherl, Kai

2013-01-01

The photocatalytic properties of titanium dioxide (TiO2) coating in the anatase crystalline structure deposited on aluminium AA1050 alloy and stainless steel S316L substrates were investigated. The coating was prepared by DC magnetron sputtering. The microstructure and surface morphology of the c......The photocatalytic properties of titanium dioxide (TiO2) coating in the anatase crystalline structure deposited on aluminium AA1050 alloy and stainless steel S316L substrates were investigated. The coating was prepared by DC magnetron sputtering. The microstructure and surface morphology...... sweep voltammetry, impedance measurements. The microstructure and surface morphology of the coating were similar irrespective of the nature of the substrate, while the photocatalytic behaviour was found to vary depending on the substrate type. In general the TiO2 coating on stainless steel was shown...

Low temperature magnetron sputter deposition of polycrystalline silicon thin films using high flux ion bombardment

International Nuclear Information System (INIS)

Gerbi, Jennifer E.; Abelson, John R.

2007-01-01

We demonstrate that the microstructure of polycrystalline silicon thin films depends strongly on the flux of low energy ions that bombard the growth surface during magnetron sputter deposition. The deposition system is equipped with external electromagnetic coils which, through the unbalanced magnetron effect, provide direct control of the ion flux independent of the ion energy. We report the influence of low energy ( + on the low temperature ( + ions to silicon neutrals (J + /J 0 ) during growth by an order of magnitude (from 3 to 30) enables the direct nucleation of polycrystalline Si on glass and SiO 2 coated Si at temperatures below 400 degree sign C. We discuss possible mechanisms for this enhancement of crystalline microstructure, including the roles of enhanced adatom mobility and the formation of shallow, mobile defects

Tribological properties, corrosion resistance and biocompatibility of magnetron sputtered titanium-amorphous carbon coatings

International Nuclear Information System (INIS)

Dhandapani, Vishnu Shankar; Subbiah, Ramesh; Thangavel, Elangovan; Arumugam, Madhankumar; Park, Kwideok; Gasem, Zuhair M.; Veeraragavan, Veeravazhuthi; Kim, Dae-Eun

2016-01-01

Highlights: • a-C:Ti nanocomposite coatings were prepared on 316L stainless steel by using R.F. magnetron sputtering method. • Properties of the nanocomposite coatings were analyzed with respect to titanium content. • Corrosion resistance, biocompatibility and hydrophobicity of nanocomposite coating were enhanced with increasing titanium content. • Coating with 2.33 at.% titanium showed superior tribological properties compared to other coatings. - Abstract: Amorphous carbon incorporated with titanium (a-C:Ti) was coated on 316L stainless steel (SS) by magnetron sputtering technique to attain superior tribological properties, corrosion resistance and biocompatibility. The morphology, topography and functional groups of the nanostructured a-C:Ti coatings in various concentrations were analyzed using atomic force microscopy (AFM), Raman, X-Ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). Raman and XPS analyses confirmed the increase in sp"2 bonds with increasing titanium content in the a-C matrix. TEM analysis confirmed the composite nature of the coating and the presence of nanostructured TiC for Ti content of 2.33 at.%. This coating showed superior tribological properties compared to the other a-C:Ti coatings. Furthermore, electrochemical corrosion studies were performed against stimulated body fluid medium in which all the a-C:Ti coatings showed improved corrosion resistance than the pure a-C coating. Preosteoblasts proliferation and viability on the specimens were tested and the results showed that a-C:Ti coatings with relatively high Ti (3.77 at.%) content had better biocompatibility. Based on the results of this work, highly durable coatings with good biocompatibility could be achieved by incorporation of optimum amount of Ti in a-C coatings deposited on SS by magnetron sputtering technique.

Transparent conducting Al-doped ZnO thin films prepared by magnetron sputtering with dc and rf powers applied in combination

International Nuclear Information System (INIS)

Minami, Tadatsugu; Ohtani, Yuusuke; Miyata, Toshihiro; Kuboi, Takeshi

2007-01-01

A newly developed Al-doped ZnO (AZO) thin-film magnetron-sputtering deposition technique that decreases resistivity, improves resistivity distribution, and produces high-rate depositions has been demonstrated by dc magnetron-sputtering depositions that incorporate rf power (dc+rf-MS), either with or without the introduction of H 2 gas into the deposition chamber. The dc+rf-MS preparations were carried out in a pure Ar or an Ar+H 2 (0%-2%) gas atmosphere at a pressure of 0.4 Pa by adding a rf component (13.56 MHz) to a constant dc power of 80 W. The deposition rate in a dc+rf-MS deposition incorporating a rf power of 150 W was approximately 62 nm/min, an increase from the approximately 35 nm/min observed in dc magnetron sputtering with a dc power of 80 W. A resistivity as low as 3x10 -4 Ω cm and an improved resistivity distribution could be obtained in AZO thin films deposited on substrates at a low temperature of 150 deg. C by dc+rf-MS with the introduction of hydrogen gas with a content of 1.5%. This article describes the effects of adding a rf power component (i.e., dc+rf-MS deposition) as well as introducing H 2 gas into dc magnetron-sputtering preparations of transparent conducting AZO thin films

Improvement in ductility of high strength polycrystalline Ni-rich Ni{sub 3}Al alloy produced by EB-PVD

Energy Technology Data Exchange (ETDEWEB)

Sun, J.Y.; Pei, Y.L.; Li, S.S.; Zhang, H.; Gong, S.K., E-mail: gongsk@buaa.edu.cn

2014-11-25

Highlights: • High strength and high ductility of polycrystalline Ni-rich Ni{sub 3}Al alloy sheets were produced. • The elongation could be enhanced from ∼0.5% to ∼14.6% by microstructural control. • The fracture strength (∼820 MPa) was enhanced by the precipitation strengthening. • This work provides a general processing for repairing the worn single crystal blades. - Abstract: A 300 μm Ni-rich Ni{sub 3}Al sheet was produced by electron beam physical vapor deposition (EB-PVD) and followed by different heat treatments to obtain fine γ′/γ two-phase structures with large elongation. Tensile testing was performed at room-temperature, and the corresponding mechanisms were investigated in detail. Results indicated that the as-deposited Ni{sub 3}Al alloy exhibited non-equilibrium directional columnar crystal, and transited to equiaxed crystal with uniformly distributed tough γ phase after heat treatment. Meanwhile, the fracture mechanism transited from brittleness to a mixture of ductility and brittleness modes. With an appropriate heat treatment, high strength (ultimate tensile strength obtained 828 MPa) and high ductility (elongation obtained 14.6%) Ni{sub 3}Al alloy has been achieved, which was due to the mesh network microstructure. A series of transmission electron microscope (TEM) characterizations confirmed that the increasing flow stress of Ni{sub 3}Al alloy was attributed to the cubical secondary γ′ phase precipitates (25–50 nm) within the γ phase. This work provides a potential strategy for repairing the worn tip of single crystal engine blades using Ni-rich Ni{sub 3}Al alloy by EB-PVD.

High power impulse magnetron sputtering and its applications

Science.gov (United States)

Yan, YUAN; Lizhen, YANG; Zhongwei, LIU; Qiang, CHEN

2018-04-01

High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

Two-dimensional spatial survey of the plasma potential and electric field in a pulsed bipolar magnetron discharge

International Nuclear Information System (INIS)

Vetushka, A.; Karkari, S.K.; Bradley, J.W.

2004-01-01

Emissive and Langmuir probe techniques have been used to obtain two-dimensional (2D) spatial maps of the plasma potential V p , electric field E, and ion trajectories in a pulsed bipolar magnetron discharge. The magnetron was pulsed at a frequency of 100 kHz, with a 50% duty cycle and operated at an argon pressure of 0.74 Pa. The pulse wave form was characterized by three distinct phases: the 'overshoot', 'reverse', and 'on' phases. In the 'on' phase of the pulse, when the cathode voltage is driven to -670 V, the 2D spatial distribution of V p has a similar form to that in dc magnetron, with significant axial and radial electric fields in the bulk plasma, accelerating ions to the sheath edge above the cathode racetrack region. During the 'overshoot' phase (duration 200 ns), V p is raised to values greater than +330 V, more than 100 V above the cathode potential, with E pointing away from the target. In the 'reverse' phase V p has a value of +45 V at all measured positions, 2 V more positive than the target potential. In this phase there is no electric field present in the plasma. In the bulk of the plasma, the results from Langmuir probe and the emissive probe are in good agreement, however, in one particular region of the plasma outside the radius of the cathode, the emissive probe measurements are consistently more positive (up to 45 V in the 'on' time). This discrepancy is discussed in terms of the different frequency response of the probes and their perturbation of the plasma. A simple circuit model of the plasma-probe system has been proposed to explain our results. A brief discussion of the effect of the changing plasma potential distribution on the operation of the magnetron is given

Time-resolved investigation of an asymmetric bipolar pulsed magnetron deposition discharge: Influence of pressure

NARCIS (Netherlands)

Dunger, Th.; Welzel, Th.; Welzel, S.; Richter, F.

2005-01-01

A bipolar pulsed magnetron deposition discharge has been studied with pulse frequencies of 100 and 150 kHz, respectively. The discharge was operated in an argon/oxygen mixture at different total pressures with a circular magnesium target as cathode. Time-resolved Langmuir double probe measurements

Deposition of copper coatings in a magnetron with liquid target

Energy Technology Data Exchange (ETDEWEB)

Tumarkin, A. V., E-mail: sanyahrustal@mail.ru; Kaziev, A. V.; Kolodko, D. V.; Pisarev, A. A.; Kharkov, M. M.; Khodachenko, G. V. [National Research Nuclear University MEPhI (Moscow Engineering Physics Institute) (Russian Federation)

2015-12-15

Copper coatings were deposited on monocrystalline Si substrates using a magnetron discharge with a liquid cathode in the metal vapour plasma. During the deposition, the bias voltage in the range from 0 V to–400 V was applied to the substrate. The prepared films were investigated by a scanning electron microscope, and their adhesive properties were studied using a scratch tester. It was demonstrated that the adhesion of the deposited films strongly depends on the bias voltage and varies in a wide range.

Deposition Rates of High Power Impulse Magnetron Sputtering: Physics and Economics

Energy Technology Data Exchange (ETDEWEB)

Anders, Andre

2009-11-22

Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase of the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes to due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes of the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction of the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits considered.

Deposition rates of high power impulse magnetron sputtering: Physics and economics

International Nuclear Information System (INIS)

Anders, Andre

2010-01-01

Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering technology, yet this is met with skepticism by others for the reported lower deposition rates, if compared to rates of more conventional sputtering of equal average power. In this contribution, the underlying physical reasons for the rate changes are discussed, including (i) ion return to the target and self-sputtering, (ii) the less-than-linear increase in the sputtering yield with increasing ion energy, (iii) yield changes due to the shift of species responsible for sputtering, (iv) changes due to greater film density, limited sticking, and self-sputtering on the substrate, (v) noticeable power losses in the switch module, (vi) changes in the magnetic balance and particle confinement of the magnetron due to self-fields at high current, and (vii) superposition of sputtering and sublimation/evaporation for selected materials. The situation is even more complicated for reactive systems where the target surface chemistry is a function of the reactive gas partial pressure and discharge conditions. While most of these factors imply a reduction in the normalized deposition rate, increased rates have been reported for certain conditions using hot targets and less poisoned targets. Finally, some points of economics and HIPIMS benefits are considered.

Synthesis and electrochemical properties of composite galvanic Ni with carbon nanomaterials and PVD Mo coatings

International Nuclear Information System (INIS)

Drozdovich, V.B.; Chayeuski, V.V.; Zhdanok, S.A.; Barkovskaya, M.M.

2011-01-01

Double layer coatings Ni – Mo were obtained by electrolytic deposition of galvanic Ni and following arc PVD deposition of molybdenum. The ion plating coatings Mo on Ni foil and composition electrolytic Ni coatings with carbon nanomaterials (CNM) deposited on mild steel has been also investigated. Composite galvanic Ni coatings with CNM and ion plating coatings Mo contain separately obtained cubic α-Mo phase as well as fragmentary solid solution Mo in Ni. Such coatings exclude hydrogenation of Ni foundation in alkaline solution and possess enlarged electrocatalytic properties while emitting hydrogen and oxygen. Availability of carbon based nanomaterials in combined coatings is cause of an active absorption hydrogen after cathodic polarization. A formation on the surface layer of nanostructure solid solution (Ni, Mo) after compression plasma flows treatment with fixed parameters of patterns Mo/Ni/ mild steel take place. (authors)

Examination of the radiation of magnetron discharge in the process of spraying thin films

International Nuclear Information System (INIS)

Sokolov, V.F.; Sokolova, Yu.A.; Protasevich, A.A.

1999-01-01

In this work, we investigated the light radiation of the magnetron discharge in order to develop a method of spectral control and regulation of the process of deposition of thin films in UVN-25 industrial equipment used for metallising of superlarge integrated circuits and other components

Dual-anticipating, dual and dual-lag synchronization in modulated time-delayed systems

International Nuclear Information System (INIS)

Ghosh, Dibakar; Chowdhury, A. Roy

2010-01-01

In this Letter, dual synchronization in modulated time delay system using delay feedback controller is proposed. Based on Lyapunov stability theory, we suggest a general method to achieve the dual-anticipating, dual, dual-lag synchronization of time-delayed chaotic systems and we find both its existing and sufficient stability conditions. Numerically it is shown that the dual synchronization is also possible when driving system contain two completely different systems. Effect of parameter mismatch on dual synchronization is also discussed. As an example, numerical simulations for the Mackey-Glass and Ikeda systems are conducted, which is in good agreement with the theoretical analysis.

RF Magnetron Sputtering Coating Of Hydroxyapatite On Alkali Solution Treated Titanate Nanorods

Directory of Open Access Journals (Sweden)

Lee K.

2015-06-01

Full Text Available Hydroxyapatite (HA is a material with outstanding biocompatibility. It is chemically similar to natural bone tissue, and has therefore been favored for use as a coating material for dental and orthopedic implants. In this study, RF magnetron sputtering was applied for HA coating. And Alkali treatment was performed in a 5 M NaOH solution at 60°C. The coated HA thin film was heat-treated at a range of temperatures from 300 to 600°C. The morphological characterization and crystal structures of the coated specimens were then obtained via FE-SEM, XRD, and FT-IR. The amorphous thin film obtained on hydrothermally treated nanorods transformed into a crystalline thin film after the heat treatment. The change in the phase transformation, with an enhanced crystallinity, showed a reduced wettability. The hydrothermally treated nanorods with an amorphous thin film, on the other hand, showed an outstanding wettability. The HA thin film perpendicularly coated the nanorods in the upper and inner parts via RF magnetron sputtering, and the FT-IR results confirmed that the molecular bonding of the coated film had an HA structure.

Deposition of Al/Cu Multilayer By Double Targets Cylindrical DC Magnetron Sputtering System

Directory of Open Access Journals (Sweden)

P. Balashabadi

2013-12-01

Full Text Available A cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. The substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. The Al/ Cu multilayer film was deposited on the glass substrate at the following conditions: Working gas = Pure argon, Working pressure = 1 Pa, Cathode current = 8 A and cathode voltage = -600 V .Microstructure of the film was investigated by X-Ray Diffraction and the scanning electron microscopy analyses. The elements profile was determined by glow discharge–optical emission spectroscopy analysis. During deposition, both targets with magnetron configuration were sputtered simultaneously by argon ions. A Plasma column on the targets surface was generated by a 290 G permanent magnet unit. Two DC power supply units with three phases input and maximum output of 12 A/1000V were used to deposit the multilayer thin films. A control phase system was used to adjust output voltage.

Wear of different PVD coatings at industrial fine-blanking field tests

Directory of Open Access Journals (Sweden)

Liina Lind

2015-09-01

Full Text Available Thin hard physical vapor deposited (PVD coatings play significant role on wear performance of fine-blanking punches in the presence of extremely high contact stresses. Nevertheless it seems that in blanking or fine-blanking the coatings are selected based on coincidence, trial-error-method or latest trends. There is limited information about planning and conducting the fine-blanking industrial field tests and measuring the wear of different coatings. In the present study a set of fine-blanking punches and laboratory specimens were prepared with three coatings – TiCN, nACRo and nACo. As substrate material Böhler S390 Microclean high speed steel was used. Coating mechanical properties (modulus of elasticity and nanohardness were measured and wear rate with alumina ball was determined using the reciprocating sliding test. Wear of coatings was measured from punches after industrial use. All of the tested coatings showed high variance of wear. However coatings nACo and nACRo have better average wear resistance in fine-blanking compared with the well-known TiCN. Industrial field tests show correlation to the ratio elastic strain to failure H/E.DOI: http://dx.doi.org/10.5755/j01.ms.21.3.7249

Some properties of the gas magnetron; neke osobine gasnog magnetrona

Energy Technology Data Exchange (ETDEWEB)

Miljevic, V [Boris Kidric Institute of nuclear sciences, Vinca, Belgrade (Yugoslavia)

1979-07-01

The cylindrical magnetron diode with directly heated cathode, filled with argon at low pressure, has been studied. In the case of high magnetic fields and low gas pressure the motion of electrons is reduced to the rotation around the cathode with superimposed allow radial drift. It is found that the plasma formation time in in the msec region. The critical magnetic field in the vacuum diode (B{sub c}), and its value increases with the increase of the anode voltage and working pressure. (author)

Microstructure and electrical properties of bismuth and bismuth oxide deposited by magnetron sputtering UBM; Microestructura y propiedades electricas de bismuto y oxido de bismuto depositados por magnetron sputtering UBM

Energy Technology Data Exchange (ETDEWEB)

Otalora B, D. M.; Dussan, A. [Universidad Nacional de Colombia, Departamento de Fisica, Grupo de Materiales Nanoestructurados y sus Aplicaciones, Carrera 30 No. 45-03, 111321 Bogota (Colombia); Olaya F, J. J., E-mail: jjolayaf@unal.edu.co [Universidad Nacional de Colombia, Facultad de Ingenieria, Departamento de Ingenieria Mecanica y Mecatronica, Carrera 30 No. 45-03, 111321 Bogota (Colombia)

2015-07-01

In this work, bismuth (Bi) and bismuth oxide (Bi{sub 2}O{sub 3}) thin films were prepared, at room temperature, by Sputtering Unbalanced Magnetron (UBM - Unbalance Magnetron) technique under glass substrates. Microstructural and electrical properties of the samples were studied by X-ray diffraction (XRD) and System for Measuring Physical Properties - PPMS (Physical Property Measurement System). Dark resistivity of the material was measured for a temperature range between 100 and 400 K. From the XRD measurements it was observed a polycrystalline character of the Bi associated to the presence of phases above the main peak, 2θ = 26.42 grades and a growth governed by a rhombohedral structure. Crystal parameters were obtained for both compounds, Bi and Bi{sub 2}O{sub 3}. From the analysis of the spectra of the conductivity as a function of temperature, it was established that the transport mechanism that governs the region of high temperature (T>300 K) is thermally activated carriers. From conductivity measurements the activation energies were obtained of 0.0094 eV and 0.015 eV for Bi{sub 2}O{sub 3} and Bi, respectively. (Author)

Tweedracht maakt macht. De PvdA, de doorbraak en de ontluikende polarisatiestrategie (1946-1966

Directory of Open Access Journals (Sweden)

B. Mellink

2011-01-01

Full Text Available Divide and Rule: The Dutch Labour Party (PvdA, the Breakthrough and the Emerging Polarisation Strategy (1946-1966In 1966, after a lengthy debate in the Dutch parliament, the Cals cabinet came to a sudden end. As a motion proposed by Norbert Schmelzer, the parliamentary leader of the prime minister’s own Catholic party precipitated the cabinet’s fall, ‘Schmelzer’s Night’ received an iconic status in Dutch political history. Many historians have interpreted Schmelzer’s Night as the birth of a Social Democratic ‘polarisation strategy’: differences between Left and Right were exaggerated in order to divide the confessional parties along ideological lines. Established analyses ascribe the development of this polarisation strategy to the ascendancy of a younger generation in Dutch politics. This article argues instead that the polarisation strategy of the late 1960s was not so much caused by a new generation, but rather emerged as a consequence of postwar Social Democrats’ efforts to abolish pillarisation (verzuiling in Dutch society.

Thin NiTi Films Deposited on Graphene Substrates

Science.gov (United States)

Hahn, S.; Schulze, A.; Böhme, M.; Hahn, T.; Wagner, M. F.-X.

2017-03-01

We present experimental results on the deposition of Nickel Titanium (NiTi) films on graphene substrates using a PVD magnetron sputter process. Characterization of the 2-4 micron thick NiTi films by electron microscopy, electron backscatter diffraction, and transmission electron microscopy shows that grain size and orientation of the thin NiTi films strongly depend on the type of combination of graphene and copper layers below. Our experimental findings are supported by density functional theory calculations: a theoretical estimation of the binding energies of different NiTi-graphene interfaces is in line with the experimentally determined microstructural features of the functional NiTi top layer.

Nucleation of ultrathin silver layer by magnetron sputtering in Ar/N2 plasma

Czech Academy of Sciences Publication Activity Database

Bulíř, Jiří; Novotný, Michal; Lančok, Ján; Fekete, Ladislav; Drahokoupil, Jan; Musil, Jindřich

2013-01-01

Roč. 228, č. 1 (2013), S86-S90 ISSN 0257-8972 R&D Projects: GA ČR(CZ) GAP108/11/1298; GA ČR GP202/09/P324 Institutional support: RVO:68378271 Keywords : ultrathin silver * magnetron sputtering * spectral ellipsometry * in-situ monitoring Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.199, year: 2013

Microstructure evolution during annealing of TiAl/NiCoCrAl multilayer composite prepared by EB-PVD

Energy Technology Data Exchange (ETDEWEB)

Zhang, Rubing, E-mail: zrb86411680@126.com [Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China); Zhang, Deming [Beijing General Research Institute of Mining and Metallurgy, Beijing 100044 (China); Chen, Guiqing [Center for Composite Materials, Harbin Institute of Technology, Harbin 150001 (China); Wang, Yuesheng [Department of Mechanics, School of Civil Engineering, Beijing Jiaotong University, Beijing 100044 (China)

2014-07-01

TiAl/NiCoCrAl laminate composite sheet with a thickness of 0.4–0.6 mm as well as a dimension of 150 mm × 100 mm was fabricated successfully by using electron beam physical vapor deposition (EB-PVD) method. The annealing treatment was processed at 1123 and 1323 K for 3 h in a high vacuum atmosphere, respectively. The phase composition and microstructure of TiAl/NiCoCrAl microlaminated sheet have been analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Based on the sheet characterization and results of the microstructure evolution during annealing treatment process, the diffusion mechanism of interfacial reaction in TiAl/NiCoCrAl microlaminate was investigated and discussed.

Performance of PVD-Coated Carbide Tools When Turning Inconel 718 in Dry Machining

Directory of Open Access Journals (Sweden)

Gusri Akhyar Ibrahim

2011-01-01

Full Text Available Inconel 718 has found its niche in many industries, owing to its unique properties such as high oxidation resistance and corrosion resistance even at very high temperatures. Coated carbide tool with hard layer of PVD TiAlN is used to turn Inconel 718. Taguchi method with the orthogonal array L9 is applied in this experiment with the parameter cutting speed of 60–80 m/min, feed rate of 0.2–0.3 mm/rev, and depth of cut of 0.3–0.5 mm. The results show that depth of cut is a significant influence to the tool life. Cutting speed of 60 m/min, feed rate of 0.2 mm/rev, and depth of cut of 0.3 mm are the optimum parameters. The flank wear, crater wear, notch wear, and nose wear are the wear mechanisms on the carbide tool. Through the SEM, abrasion, attrition, and adhesion are the wear mechanisms which can be seen on the cutting tool.

Interfacial Structure and Photocatalytic Activity of Magnetron Sputtered TiO2 on Conducting Metal Substrates

DEFF Research Database (Denmark)

Daviðsdóttir, Svava; Petit, Jean-Pierre; Mermoux, Michel

2014-01-01

The photocatalytic behavior of magnetron sputtered anatase TiO2 coatings on copper, nickel, and gold was investigated with the aim of understanding the effect of the metallic substrate and coating-substrate interface structure. Stoichiometry and nanoscale structure of the coating were investigated...

Residual stress and texture in Aluminum doped Zinc Oxide layers deposited by reactive radio frequency magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Azanza Ricardo, C.L., E-mail: Cristy.Azanza@ing.unitn.it [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy); Pastorelli, M.; D' Incau, M. [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy); Aswath, P. [College of Engineering, University of Texas at Arlington, TX (United States); Scardi, P. [Department of Civil, Environmental and Mechanical Engineering, University of Trento, 38123 via Mesiano 77, Trento (Italy)

2016-04-30

Aluminum doped Zinc Oxide thin films were deposited on standard soda-lime substrates by reactive radio frequency magnetron sputtering. Residual stress and texture were studied by X-ray diffraction, while X-ray Absorption Near Edge Spectroscopy provided information on the Al environment in the best performing thin films. The influence of deposition parameters on structural and microstructural properties is discussed. A correlation between microstructure and residual stress state with electrical and optical properties is proposed. - Highlights: • Al doped ZnO thin films were obtained by reactive radio frequency magnetron sputtering. • Correlation of stresses and texture with electrical and optical properties is shown. • Homogeneous and stress-free thin-films are the best performing ones. • XANES confirmed the doping mechanism and excluded some spurious phases.

PVD-Alumina Coatings on Cemented Carbide Cutting Tools: A Study About the Effect on Friction and Adhesion Mechanism

Directory of Open Access Journals (Sweden)

S.E. Cordes

2012-03-01

Full Text Available Crystalline PVD γ-alumina coatings are interesting for machining operations due to their outstanding characteristics, such as high hot hardness, high thermal stability and low tendency to adhesion. In the present work (Ti,AlN/γ-Al2O3-coatings are deposited on cemented carbide by means of MSIP. Objectives of this work are to study the effects of coating and cutting fluid regarding friction in tribological tests and to study the wear mechanisms and cutting performance of γ-Al2O3-based coated cemented carbide cutting tools in machining operations of austenitic stainless steels. Based on the remarkable properties of the coating system the performance of the cutting tools is increasing significantly.

Dual Entwining Structures and Dual Entwined Modules

OpenAIRE

Abuhlail, Jawad Y.

2003-01-01

In this note we introduce and investigate the concepts of dual entwining structures and dual entwined modules. This generalizes the concepts of dual Doi-Koppinen structures and dual Doi-Koppinen modules introduced (in the infinite case over rings) by the author is his dissertation.

DC Magnetron sputtering of Y-Ba-Cu-O thin films

International Nuclear Information System (INIS)

Larsson, Gunnar.

1990-01-01

I have been studying dc magnetron sputtering of thin film YBa 2 Cu 3 O 6+x , one of the recently discovered high- temperatures superconductors. In the introduction a brief review of the subjects sputtering and superconductivity is given. Since partial pressure measurements, especially for oxygen, have been important in the work I include a short description of the operating principles of mass spectroscopy. Experimental results in addition to what is given in the papers concerning plasma are presented in an appendix at the end of the introduction. (au)

Effect of substrate bias on structure and properties of the TiN coatings obtained in the PVD process

International Nuclear Information System (INIS)

Dobrzanski, L.A.; Kwasny, W.

2003-01-01

The paper presents investigation results of the field of deposition parameters on structure and mechanical properties of the TiN coatings obtained by magnetron sputtering in the vacuum furnace onto the ASP 30 sintered high speed steel. Effect of sputtering parameters on chemical and phase composition, thickness, microhardness and roughness parameter. The characteristic structure and surface topography of the analyzed coatings are presented. (author)

Giant Negative Piezoresistive Effect in Diamond-like Carbon and Diamond-like Carbon-Based Nickel Nanocomposite Films Deposited by Reactive Magnetron Sputtering of Ni Target

DEFF Research Database (Denmark)

Meškinis, Šaru Nas; Gudaitis, Rimantas; Šlapikas, Kęstutis

2018-01-01

deposited by either reactive HIPIMS or dc magnetron sputtering of Ni target was explained by possible clustering of the sp2-bonded carbon and/or formation of areas with the decreased hydrogen content. It was suggested that the tensile stress-induced rearrangements of these conglomerations have resulted......Piezoresistive properties of hydrogenated diamond-like carbon (DLC) and DLC-based nickel nanocomposite (DLC:Ni) films were studied in the range of low concentration of nickel nanoparticles. The films were deposited by reactive high power pulsed magnetron sputtering (HIPIMS) of Ni target, and some...... samples were deposited by direct current (dc) reactive magnetron sputtering for comparison purposes. Raman scattering spectroscopy, energy-dispersive X-ray spectrometry (EDS), and X-ray photoelectron spectroscopy (XPS) were used to study the structure and chemical composition of the films. A four...

ZnO film deposition by DC magnetron sputtering: Effect of target configuration on the film properties

Energy Technology Data Exchange (ETDEWEB)

Arakelova, E.; Khachatryan, A.; Kteyan, A.; Avjyan, K.; Grigoryan, S.

2016-08-01

Ballistic transport model for target-to-substrate atom transfer during magnetron sputter deposition was used to develop zinc target (cathode) configuration that enabled growth of uniform zinc oxide films on extensive surfaces and provided reproducibility of films characteristics irrespective of the cathode wear-out. The advantage of the developed target configuration for high-quality ZnO film deposition was observed in the sputtering pressure range of 5− 50 mTorr, and in the range of cathode-to-substrate distances 7–20 cm. Characteristics of the deposited films were demonstrated by using X-ray diffraction analysis, as well as optical and electrical measurements. - Highlights: • Change of target configuration for optimization of magnetron sputtering deposition is proposed. • Improvement of ZnO film properties due to use of this target is demonstrated. • This configuration provided reproducibility of the deposited films properties.

Magnetron sputtered gadolinia-doped ceria diffusion barriers for metal-supported solid oxide fuel cells

DEFF Research Database (Denmark)

Sønderby, Steffen; Klemensø, Trine; Christensen, Bjarke H.

2014-01-01

Gadolinia-doped ceria (GDC) thin films are deposited by reactive magnetron sputtering in an industrial-scale setup and implemented as barrier layers between the cathode and electrolyte in metal-based solid oxide fuel cells consisting of a metal support, an electrolyte of ZrO2 co-doped with Sc2O3...

Unbalanced Cylindrical Magnetron for Accelerating Cavities Coating

CERN Document Server

Rosaz, Guillaume; Calatroni, Sergio; Sublet, Alban; Tobarelli, Mauro

2016-01-01

We report in this paper the design and qualification of a cylindrical unbalanced magnetron source. The dedicated magnetic assemblies were simulated using a finite element model. A hall-effect magnetic probe was then used to characterize those assemblies and compared to the theoretical magnet profiles. These show a good agreement between the expected and actual values. the qualification of the different magnetic assemblies was then performed by measuring the ion flux density reaching the surface of the sample to be coated using a commercial retarding field energy analyzer. The strongest unbalanced configuration shows an increase from 0.016A.cm^-2 to 0.074A.cm^-2 of the ion flux density reaching the sample surface compared to the standard balanced configuration for a pressure 5.10^-3 mbar and a plasma source power of 300W.

Crystalline silicon films grown by pulsed dc magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Reinig, Peter; Fenske, Frank; Fuhs, Walther; Selle, Burkhardt [Hahn-Meitner-Institut Berlin, Abt. Silizium-Photovoltaik, Kekulestr. 5, D-12489 Berlin (Germany)

2002-04-01

Pulsed dc magnetron sputtering is used as a novel method for the deposition of crystalline silicon films on glass substrates. Hydrogen-free polycrystalline Si-films are deposited with high deposition rates at temperatures of 400-450 C and pulse frequencies f in the range 0-250 kHz. Strong preferential (100) orientation of the crystallites is observed with increasing f. High frequency and similarly high negative substrate bias cause an increase of the Ar content and an enhancement of structural disorder. Measurements of the transient floating potential suggest that the observed structural effects are related to bombardment of the growing film by Ar{sup +} ions of high energy.

Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

NARCIS (Netherlands)

Rafieian Boroujeni, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G.H.

2015-01-01

We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to

Nanoscale Cu{sub 2}O films: Radio-frequency magnetron sputtering and structural and optical studies

Energy Technology Data Exchange (ETDEWEB)

Kudryashov, D. A., E-mail: kudryashovda@apbau.ru; Gudovskikh, A. S. [Russian Academy of Sciences, St. Petersburg National Research Academic University — Nanotechnology Research and Education Center (Russian Federation); Babichev, A. V.; Filimonov, A. V. [Connector Optics LLC (Russian Federation); Mozharov, A. M. [Russian Academy of Sciences, St. Petersburg National Research Academic University — Nanotechnology Research and Education Center (Russian Federation); Agekyan, V. F.; Borisov, E. V.; Serov, A. Yu.; Filosofov, N. G. [St. Petersburg State University (Russian Federation)

2017-01-15

Nanoscale copper (I) oxide layers are formed by magnetron-assisted sputtering onto glassy and silicon substrates in an oxygen-free environment at room temperature, and the structural and optical properties of the layers are studied. It is shown that copper oxide formed on a silicon substrate exhibits a lower degree of disorder than that formed on a glassy substrate, which is supported by the observation of a higher intensity and a smaller half-width of reflections in the diffraction pattern. The highest intensity of reflections in the diffraction pattern is observed for Cu{sub 2}O films grown on silicon at a magnetron power of 150 W. The absorption and transmittance spectra of these Cu{sub 2}O films are in agreement with the well-known spectra of bulk crystals. In the Raman spectra of the films, phonons inherent in the crystal lattice of cubic Cu{sub 2}O crystals are identified.

Depth profile analyses of nc-TiC/a-C:H coating prepared by balanced magnetron sputtering

Czech Academy of Sciences Publication Activity Database

Vašina, P.; Souček, P.; Schmidtová, T.; Eliáš, M.; Buršíková, V.; Jílek, M.; Jílek Jr., M.; Schäfer, C.; Buršík, Jiří

2011-01-01

Roč. 205, Suppl. 2 (2011), S53-S56 ISSN 0257-8972 Institutional research plan: CEZ:AV0Z20410507 Keywords : composite * mechanical properties * magnetron Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 1.867, year: 2011

Residual stress in ion implanted titanium nitride studied by parallel beam glancing incidence x-ray diffraction

International Nuclear Information System (INIS)

Geist, D.E.; Perry, A.J.; Treglio, J.R.; Valvoda, V.; Rafaja, D.

1995-01-01

Ion implantation is known to increase the lifetime of cutting tools. Current theories are the increase in lifetime is caused by an increase in the residual stress, or by work hardening of the surface associated with the implantation. In this work the effect of ion implantation on the residual stress in titanium nitride coatings made by the standard industrial methods of chemical and physical vapor deposition (CVD and PVD) is studied. It is found in the as-received condition (unimplanted), the residual stress levels are near zero for CVD materials and highly compressive, of the order of 6 GPa, for PVD materials. Ion implantation has no effect on the residual stress in the coatings made by CVD. Nitrogen does increase the compressive residual stress by some 10% in the near surface regions of PVD coatings, while nickel-titanium dual metal ion implantation does not have any effect. It appears that the lifetime increase is not associated with residual stress effects

The effect of brain hematoma location on volumetric inductive phase shift spectroscopy of the brain with circular and magnetron sensor coils: a numerical simulation study

International Nuclear Information System (INIS)

Rojas, R; González, C A; Rubinsky, B

2008-01-01

This numerical simulation study addressed the effects of the location of a discrete brain hematoma on the volumetric inductive phase shift of the brain measured with an induction circular sensor coil and an induction magnetron sensor coil. The theoretical study simulates the brain cavity as a circular sphere transversely centered with respect to the circular and magnetron sensor coils. As a case study for the effects of hematoma location, we employed similar size simulated spherical hematomas placed at three different positions from the center of the brain outward. A three-dimensional finite element analysis of the field equations in the frequency range from 100 kHz to 100 MHz revealed a substantial effect of hematoma location on the ability of both the circular and magnetron sensors to detect the hematomas. In particular it was found that there are frequencies, which may be related to resonance, at which the occurrence of the hematomas has no effect on the volumetric inductive phase shift of the brain. Furthermore it was found that the relative sensitivity of circular and magnetron sensor coils with respect to the occurrence of hematoma varies with the location of the hematoma

Reactive magnetron sputtering of Si-C-N films with controlled mechanical and optical properties

Czech Academy of Sciences Publication Activity Database

Vlček, J.; Kormunda, M.; Čížek, J.; Soukup, Z.; Peřina, Vratislav; Zemek, Josef

2003-01-01

Roč. 12, č. 8 (2003), s. 1287-1294 ISSN 0925-9635 R&D Projects: GA MŠk ME 203; GA MŠk OC 527.90 Institutional research plan: CEZ:MSM 235200002 Keywords : silicon-carbon-nitride films * magnetron co-sputtering Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 1.867, year: 2003

Study on the preparation of boron-rich film by magnetron sputtering in oxygen atmosphere

Energy Technology Data Exchange (ETDEWEB)

Pan, Zhangmin; Yang, Yiming; Huang, Jian; Ren, Bing; Yu, Hongze; Xu, Run; Ji, Huanhuan; Wang, Lin; Wang, Linjun, E-mail: ljwang@shu.edu.cn

2016-12-01

Highlights: • Boron ({sup 10}B) oxide films were successfully grown using RF magnetron sputtering. • Effects of oxygen partial pressure on the property of the films were studied. • Substrates were covered with B-rich film and film surface was covered with B{sub 2}O{sub 3}. • The growth mechanism of films in oxygen atmosphere was analyzed using XPS. - Abstract: In this paper, the growth of boron ({sup 10}B) oxide films on (1 0 0) silicon substrate were achieved by radio frequency (r.f.) magnetron sputtering under the different oxygen partial pressure with a target of boron and boron oxide. The structure and properties of deposited films were characterized by X-ray diffraction (XRD), Fourier transform infrared spectroscopy spectrometer (FTIR), X-ray photoelectron spectroscopy (XPS), respectively. The results showed that the substrate was covered with boron-rich films tightly and the surface of films was covered with B{sub 2}O{sub 3}. And the growth mechanism of boron-rich film in oxygen atmosphere was also analyzed.

Microstructure and electrical properties of bismuth and bismuth oxide deposited by magnetron sputtering UBM

International Nuclear Information System (INIS)

Otalora B, D. M.; Dussan, A.; Olaya F, J. J.

2015-01-01

In this work, bismuth (Bi) and bismuth oxide (Bi 2 O 3 ) thin films were prepared, at room temperature, by Sputtering Unbalanced Magnetron (UBM - Unbalance Magnetron) technique under glass substrates. Microstructural and electrical properties of the samples were studied by X-ray diffraction (XRD) and System for Measuring Physical Properties - PPMS (Physical Property Measurement System). Dark resistivity of the material was measured for a temperature range between 100 and 400 K. From the XRD measurements it was observed a polycrystalline character of the Bi associated to the presence of phases above the main peak, 2θ = 26.42 grades and a growth governed by a rhombohedral structure. Crystal parameters were obtained for both compounds, Bi and Bi 2 O 3 . From the analysis of the spectra of the conductivity as a function of temperature, it was established that the transport mechanism that governs the region of high temperature (T>300 K) is thermally activated carriers. From conductivity measurements the activation energies were obtained of 0.0094 eV and 0.015 eV for Bi 2 O 3 and Bi, respectively. (Author)

Microstructural control of TiC/a-C nanocomposite coatings with pulsed magnetron sputtering

International Nuclear Information System (INIS)

Pei, Y.T.; Chen, C.Q.; Shaha, K.P.; De Hosson, J.Th.M.; Bradley, J.W.; Voronin, S.A.; Cada, M.

2008-01-01

In this paper, we report some striking results on the microstructural control of TiC/a-C nanocomposite coatings with pulsed direct current (DC) magnetron sputtering. The interface morphology and microstructure evolution as a function of pulse frequency and duty cycle were scrutinized using atomic force microscopy, scanning electron microscopy and high-resolution transmission electron microscopy techniques. It is shown that, with increasing pulse frequency, the nanocomposite coatings exhibit evolutions in morphology of the growing interface from rough to smooth and in the microstructure from strongly columnar to fully columnar-free. In addition, the smoothly growing interface favors the formation of a tailor-made multilayered nanocomposite structure. The fundamental mechanisms are analyzed with the assistance of plasma diagnostic experiments. Ion mass/energy spectrometry measurements reveal that, depending on the frequency and duty cycle of DC pulses, pulsing of the magnetrons can control the flux and energy distribution of Ar + ions over a very broad range for concurrent impingement on the growing interface of deposited coatings, in comparison with DC sputtering. The significantly enhanced energy flux density is thought to be responsible for the 'adatom transfer' in interface smoothening and thus the restraint of columnar growth

Investigation of the possible technological use of magnetron-synthetic coverings on the basis of niobium nitridium to manufacture high conductivity windings during the generation of power magnetic fields

International Nuclear Information System (INIS)

Kadyrzhanov, K.; Zhetbaev, A.; Tuleushev, A.; Penkov, F.; Lisitsin, V.; Kim, S.; Tuleushev, Yu.; Turkebaev, T.; Borisenko, A.; Gorlachev, I.; Platov, A.; Lisuchin, S.; Skoz, E.; Zhukov, V.; Guliykin, Yu.; Chavalinsky, Yu.

1996-01-01

The main objective. The objective of this project is to investigate the possibilities for technological use of niobium nitride-based magnetron synthesized coatings for the purpose of manufacture of superconducting tape windings when generating strong magnetic fields for NMR-tomographs and commercial magnets. Background. Niobium nitride can be produced by sputtering as a continuous coating directly on the surface of a substrate made of a normal conductor, e.g. a copper or aluminium thin tape, by well-known techniques of plasma-chemical synthesis, using magnetron procedure (d.c. magnetron), allowing al synthesis, using magnetron procedure (d.c. magnetron), allowing to solve some difficult problems of superconductor manufacture by means of plastic deformation. For example, risk of break of a superconducting thread will no longer arises and the procedure of control for heat removal and relation between the thickness of superconducting and normal components will be made much easier, and, in turn, this enables to enhance stability of superconductivity and to prevent flux quench. Methodology. The group of eleven specialists from NNC RK will be occupied in the magnetron synthesis of niobium nitride coatings of copper and aluminum foils (five persons) and in its X-ray, nuclear-physical and electron microscopic analysis (six persons). The group of six specialists from the ULBA plant will be occupied in determination of the critical parameters of belt samples with niobium nitride coatings produced by Inst. of Nuclear Physics' specialists. Multi-purpose research test benches for determination of superconductor critical parameters that are available at the ULBA enables to test different types superconductor characteristics, including film ones, in magnetic fields up to 11 T at helium temperatures. Expected Results. As the result of the project execution complete evaluation concerning technical reasoning for magnetron ways of coating synthesis of niobium nitride when

Mechanical properties of EB-PVD ZrO2 thermal barrier coatings

International Nuclear Information System (INIS)

Held, Carolin

2014-01-01

In this work, the elastic properties of thermal barrier coatings which were produced by electron-beam enhanced physical vapour deposition were investigated, as well as the dependency of the properties on the sample microstructure, the thermal treatment and the test method. For this purpose, not only commercial coatings were characterized, but also special sample material was used which consists of a 1 mm thick layer of EB-PVD TBC. This material was isothermally heat treated for different times at 950 C, 1100 C and 1200 C and then tested in a specially developed miniaturized bend test and by dynamic mechanical analysis. The sample material was tested by nanoindentation in order to measure the Young's modulus on a local scale, and the porosity of the samples was determined by microstructure analysis and porosimetry. The decrease of porosity could be connected with sintering and subsequent stiffening of the material. The test results are dependent on the tested volume. A small test volume leads to larger measured Young's moduli, while a large test volume yields lower values. The test volume also has an influence on the increase of stiffness during thermal exposure. With a small tested volume, a quicker increase of the Young's modulus was registered, which could be associated to the sintering of local structures.

Metal-oxide-junction, triple point cathodes in a relativistic magnetron

International Nuclear Information System (INIS)

Jordan, N. M.; Gilgenbach, R. M.; Hoff, B. W.; Lau, Y. Y.

2008-01-01

Triple point, defined as the junction of metal, dielectric, and vacuum, is the location where electron emission is favored in the presence of a sufficiently strong electric field. To exploit triple point emission, metal-oxide-junction (MOJ) cathodes consisting of dielectric ''islands'' over stainless steel substrates have been fabricated. The two dielectrics used are hafnium oxide (HfO x ) for its high dielectric constant and magnesium oxide (MgO) for its high secondary electron emission coefficient. The coatings are deposited by ablation-plasma-ion lithography using a KrF laser (0-600 mJ at 248 nm) and fluence ranging from 3 to 40 J/cm 2 . Composition and morphology of deposited films are analyzed by scanning electron microscopy coupled with x-ray energy dispersive spectroscopy, as well as x-ray diffraction. Cathodes are tested on the Michigan Electron Long-Beam Accelerator with a relativistic magnetron, at parameters V=-300 kV, I=1-15 kA, and pulse lengths of 0.3-0.5 μs. Six variations of the MOJ cathode are tested, and are compared against five baseline cases. It is found that particulate formed during the ablation process improves the electron emission properties of the cathodes by forming additional triple points. Due to extensive electron back bombardment during magnetron operation, secondary electron emission also may play a significant role. Cathodes exhibit increases in current densities of up to 80 A/cm 2 , and up to 15% improvement in current start up time, as compared to polished stainless steel cathodes

Investigation of the time evolution of plasma parameters in a pulsed magnetron discharge

Czech Academy of Sciences Publication Activity Database

Straňák, V.; Hubička, Zdeněk; Adámek, P.; Blažek, J.; Tichý, M.; Špatenka, P.; Hippler, R.; Wrehde, S.

2006-01-01

Roč. 56, - (2006), s. 1364-1370 ISSN 0011-4626 R&D Projects: GA ČR GA202/05/2242; GA ČR GA202/06/0776 Grant - others:Deutsche Forschungsgemeinschaft(DE) SFB/TR 24 Institutional research plan: CEZ:AV0Z10100522 Keywords : pulsed magnetron * time resolved measurements * Langmuir probe Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.568, year: 2006

A comparison of plasma in laser and hybrid laser-magnetron SiC deposition systems

Czech Academy of Sciences Publication Activity Database

Novotný, Michal; Bulíř, Jiří; Lančok, Ján; Jelínek, Miroslav

2007-01-01

Roč. 4, - (2007), S1017-S1021 ISSN 1612-8850 R&D Projects: GA AV ČR KJB1010417; GA ČR GA202/06/0216 Institutional research plan: CEZ:AV0Z10100522 Keywords : laser ablation * magnetron sputtering * optical emission spectroscopy Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.132, year: 2007

Low-Temperature Cu-Cu Bonding Using Silver Nanoparticles Fabricated by Physical Vapor Deposition

Science.gov (United States)

Wu, Zijian; Cai, Jian; Wang, Junqiang; Geng, Zhiting; Wang, Qian

2018-02-01

Silver nanoparticles (Ag NPs) fabricated by physical vapor deposition (PVD) were introduced in Cu-Cu bonding as surface modification layer. The bonding structure consisted of a Ti adhesive/barrier layer and a Cu substrate layer was fabricated on the silicon wafer. Ag NPs were deposited on the Cu surface by magnetron sputtering in a high-pressure environment and a loose structure with NPs was obtained. Shear tests were performed after bonding, and the influences of PVD pressure, bonding pressure, bonding temperature and annealing time on shear strength were assessed. Cu-Cu bonding with Ag NPs was accomplished at 200°C for 3 min under the pressure of 30 MPa without a post-annealing process, and the average bonding strength of 13.99 MPa was reached. According to cross-sectional observations, a void-free bonding interface with an Ag film thickness of around 20 nm was achieved. These results demonstrated that a reliable low-temperature short-time Cu-Cu bonding was realized by the sintering process of Ag NPs between the bonding pairs, which indicated that this bonding method could be a potential candidate for future ultra-fine pitch 3D integration.

Characterization of the corrosion behavior of an austenitic stainless steel for biomedical applications coated with Ti N, Ti CN And DLC PVD coatings

International Nuclear Information System (INIS)

Antunes, Renato Altobelli

2006-01-01

Metallic biomaterials must present a combination of properties such as corrosion resistance, biocompatibility and mechanical resistance. Austenitic stainless steels, especially AISI 316L combine these properties with the easy of fabrication at low cost. However, they are prone to corrosion in physiological solutions. Furthermore, their corrosion products may lead to infectious ou allergenic reactions in the tissues around the implant device. In the present work, coatings produced by physical vapour deposition (PVD) methods have been applied on the surface of a 316L stainless steel to increase its corrosion resistance and biocompatibility. Three thin films were tested: titanium nitride (TiN), titanium carbonitride (TiCN) and diamond-like carbon (DLC). These materials present high hardness, wear resistance and intrinsic biocompatibility that are key features when considering biomedical applications. The characterization of the electrochemical behavior of the stainless steel coated with the three different films showed that the presence of surface defects are deleterious to the corrosion resistance of the substrate. These defects were observed using scanning electron microscopy. The evolution of the electrochemical behavior of the coated steel was explained through a mechanism based on the experimental results obtained using electrochemical impedance spectroscopy. Two different passivation treatments were carried out on the stainless steel surface, either in sulfuric or nitric acid solutions, to increase its corrosion resistance. The results suggested que these treatments were not efficient, but may be modified to improve its performance. The electronic properties of the passive films of the non-passivated and passivated stainless steel were studied using the Mott-Schottky approach. The films presented a duplex character. Below the flat band potential the behavior is typical of a highly doped type-p semiconductor. Above the flat band potential is typical of a highly

Effect of Hf Additions to Pt Aluminide Bond Coats on EB-PVD TBC Life

Science.gov (United States)

Nesbitt, James; Nagaraj, Ben; Williams, Jeffrey

2000-01-01

Small Hf additions were incorporated into a Pt aluminide coating during chemical vapor deposition (CVD) on single crystal RENE N5 substrates. Standard yttria-stabilized zirconia top coats were subsequently deposited onto the coated substrates by electron beam-physical vapor deposition (EB-PVD). The coated substrates underwent accelerated thermal cycle testing in a furnace at a temperature in excess of 1121 C (2050 F) (45 minute hot exposure, 15 minute cool to approximately 121 C (250 F)) until the thermal barrier coating (TBC) failed by spallation. Incorporating Hf in the bond coat increased the TBC life by slightly more than three times that of a baseline coating without added Hf. Scanning electron microscopy of the spalled surfaces indicated that the presence of the Hf increased the adherence of the thermally grown alumina to the Pt aluminide bond coat. The presence of oxide pegs growing into the coating from the thermally grown alumina may also partially account for the improved TBC life by creating a near-surface layer with a graded coefficient of thermal expansion.

The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Lisco, F., E-mail: F.Lisco@lboro.ac.uk [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Kaminski, P.M.; Abbas, A.; Bass, K.; Bowers, J.W.; Claudio, G. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom); Losurdo, M. [Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari (Italy); Walls, J.M. [Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire, LE11 3TU (United Kingdom)

2015-05-01

Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing. - Highlights: • Pulsed DC magnetron sputtering (PDCMS) of CdS films • Chemical bath deposition of CdS films • Comparison between CdS thin films deposited by chemical bath and PDCMS techniques • High deposition rate deposition for PDCMS deposition • Uniform, pinhole free CdS thin films.

The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

International Nuclear Information System (INIS)

Lisco, F.; Kaminski, P.M.; Abbas, A.; Bass, K.; Bowers, J.W.; Claudio, G.; Losurdo, M.; Walls, J.M.

2015-01-01

Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing. - Highlights: • Pulsed DC magnetron sputtering (PDCMS) of CdS films • Chemical bath deposition of CdS films • Comparison between CdS thin films deposited by chemical bath and PDCMS techniques • High deposition rate deposition for PDCMS deposition • Uniform, pinhole free CdS thin films

Growth behavior of rat bone marrow cells on RF magnetron sputtered hydroxyapatite and dicalcium pyrophosphate coatings.

NARCIS (Netherlands)

Yan, Y.; Wolke, J.G.C.; Ruijter, A. De; Yubao, L.; Jansen, J.A.

2006-01-01

The aim of this study was to evaluate the osteogenic properties of magnetron sputtered dicalcium pyrophaosphate (DCPP) and hydroxylapatite (HA) coatings. Therefore, DCPP and HA coatings were deposited on grit-blasted titanium discs. The substrates were used as-prepared or received an additional heat

Antibacterial properties of nano-silver coated PEEK prepared through magnetron sputtering.

Science.gov (United States)

Liu, Xiuju; Gan, Kang; Liu, Hong; Song, Xiaoqing; Chen, Tianjie; Liu, Chenchen

2017-09-01

We aimed to investigate the cytotoxicity and antibacterial properties of nano-silver-coated polyetheretherketone (PEEK) produced through magnetron sputtering and provide a theoretical basis for its use in clinical applications. The surfaces of PEEKs were coated with nano-silver at varying thicknesses (3, 6, 9, and 12nm) through magnetron sputtering technology. The resulting coated PEEK samples were classified into the following groups according to the thickness of the nano-silver coating: PEEK-3 (3nm), PEEK-6 (6nm), PEEK-9 (9nm), PEEK-12 (12nm), and PEEK control group. The surface microstructure and composition of each sample were observed by scanning electron microscopy (SEM), atomic force microscopy (AFM), and energy dispersive spectrum (EDS) analysis. The water contact angle of each sample was then measured by contact angle meters. A cell counting kit (CCK-8) was used to analyze the cytotoxicity of the mouse fibroblast cells (L929) in the coated groups (n=5) and group test samples (n=6), negative control (polyethylene, PE) (n=6), and positive control group (phenol) (n=6). The antibacterial properties of the samples were tested by co-culturing Streptococcus mutans and Straphylococcus aureus. The bacteria that adhered to the surface of samples were observed by SEM. The antibacterial adhesion ability of each sample was then evaluated. SEM and AFM analysis results showed that the surfaces of control group samples were smooth but compact. Homogeneous silver nano-particles (AgNPs) and nano-silver coating were uniformly distributed on the surface of the coated group samples. Compared with the control samples, the nano-silver coated samples had a significant increase in surface roughness (Pnano-silver coating increased. EDS analysis showed that not only C and O but also Ag were present on the surface of the coated samples. Moreover, the water contact angle of modified samples significantly increased after nano-silver coating modification (Pnano-silver coating can

Advanced TiC/a-C: H nanocomposite coatings deposited by magnetron sputtering

OpenAIRE

Pei, Y.T.; Galvan, D.; Hosson, J.Th.M. De; Strondl, C.

2006-01-01

TiC/a-C:H nanocomposite coatings have been deposited by magnetron Sputtering. They consist of 2-5 nm TiC nanocrystallites embedded in the amorphous hydrocarbon (a-C:H) matrix. A transition from a Columnar to a glassy microstructure has been observed in the nanocomposite coatings with increasing substrate bias or carbon content. Micro-cracks induced by nanoindentation or wear tests readily propagate through the column boundaries whereas the coatings without a columnar inicrostructure exhibit s...

Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods

Czech Academy of Sciences Publication Activity Database

Straňák, V.; Wulff, H.; Rebl, H.; Zietz, C.; Arndt, K.; Bogdanowicz, R.; Nebe, B.; Bader, R.; Podbielski, A.; Hubička, Zdeněk; Hippler, R.

2011-01-01

Roč. 31, č. 7 (2011), s. 1512-1519 ISSN 0928-4931 R&D Projects: GA ČR(CZ) GAP205/11/0386; GA MŠk(CZ) 1M06002 Institutional research plan: CEZ:AV0Z10100520 Keywords : implant coating * titanium-copper film * pulsed magnetron sputtering Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.686, year: 2011

Tribological Behavior of Coating Cr Layer on 40Cr after Surface Electron Beam Pretreatment

Science.gov (United States)

Hu, J. J.; Wang, J.; Jiang, P.; Xu, H. B.; Li, H.; Hou, T. F.

2017-12-01

In this study,the friction and wear behavior of PVD coatings which were treated by 5 different processes,based on gear material-40Cr. Analyzing the effects of treating the gear material with electron beam in combination with magnetron sputtering on it,for dry friction and wear properties.The result showed that the electron beam pretreated substrate was useful to improve the tribological performance of coating material.Furthermore, the surface roughness of coating, the bonding force between substrate and coating as well as the load are the main factors affecting the tribological performance of this coating. Most importantly, the contribution of plowing effect on friction coefficient should be considered when the surface roughness is high.

Some properties of dual and approximate dual of fusion frames

OpenAIRE

Arefijamaal, Ali Akbar; Neyshaburi, Fahimeh Arabyani

2016-01-01

In this paper we extend the notion of approximate dual to fusion frames and present some approaches to obtain dual and approximate alternate dual fusion frames. Also, we study the stability of dual and approximate alternate dual fusion frames.

Deposition of thin films by magnetron sputtering molybdenum in samples of pure copper; Deposicao de filmes finos de molibdenio por magnetron sputtering em amostra de cobre puro

Energy Technology Data Exchange (ETDEWEB)

Ferreira, N.M.; Almeida, E.O. de; Alves Junior, C. [Universidade Federal do Rio Grande do Norte, Campus Universitario Lagoa Nova, PPGCEM - Natal, RN (Brazil); Lourenco, J.M. [Instituto Federal de Educacao, Ciencias e Tecnologia do Rio Grande do Norte (IFRN), Natal, RN (Brazil)

2010-07-01

The deposition surface is a process of thermochemical treatment, which involves the deposition of a thin film usually about one to two microns on a metallic substrate, which constitutes one of the most important surface engineering techniques. The plasma deposition process with the configuration of magnetron sputtering it is removing material from a solid surface (target) through the impact of energetic particles from plasma. The aim of this study is to characterize the microstructure of the material under study using the techniques of optical microscopy and scanning electron microscopy. (author)

Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

Science.gov (United States)

Song, Liang; Wang, Xianping; Wang, Le; Zhang, Ying; Liu, Wang; Jiang, Weibing; Zhang, Tao; Fang, Qianfeng; Liu, Changsong

2017-04-01

He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y2O3 in the FeCrNi films was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y2O3 in FeCrNi films, and Y2O3 content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y2O3 apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (˜17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.

Surface functionalization of nanostructured LaB{sub 6}-coated Poly Trilobal fabric by magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Wu, Yan, E-mail: wuyanchn@hotmail.com [Mechanical and Electrical Engineering Branch, Jiaxing Nanyang Polytechnic Institute, Jiaxing 314003 (China); Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061 (China); Zhang, Lin, E-mail: zhanglin2007@sdu.edu.cn [Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061 (China); Min, Guanghui, E-mail: ghmin@sdu.edu.cn [Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061 (China); Yu, Huashun; Gao, Binghuan; Liu, Huihui; Xing, Shilong; Pang, Tao [Key Laboratory for Liquid-Solid Structural Evolution and Processing of Materials (Ministry of Education), Shandong University, Jinan 250061 (China)

2016-10-30

Highlights: • Nanostructured LaB{sub 6} films were deposited on flexible textile substrates by dc magnetron sputtering. • The pronounced influence of the working pressure on the morphologies and optical properties of LaB{sub 6} films has been revealed. • The concept of Ultraviolet Protection Factor (UPF) was employed and LaB{sub 6}-coated PET textiles with ultraviolet protection ability were obtained. - Abstract: Nanostructured LaB{sub 6} films were deposited on flexible Poly Trilobal substrates (PET textiles) through direct current magnetron sputtering in order to broaden its applications and realize surface functionalization of polyester fabrics. Characterizations and performances were investigated by employing a scanning electron microscope (SEM), Fourier transformation infrared spectroscopy (FT-IR) and ultraviolet-visible (UV–vis) spectrophotometer. Ultraviolet Protection Factor (UPF) conducted by the integral conversion was employed to measure the ultraviolet protection ability. As expected, the growth of LaB{sub 6} film depending on the pressure variation enhanced UV-blocking ability (UPF rating at 30.17) and absorption intensity of the textiles.

Preparation of single-crystal TiC (111) by radio frequency magnetron sputtering at low temperature

International Nuclear Information System (INIS)

Qi, Q.; Zhang, W.Z.; Shi, L.Q.; Zhang, W.Y.; Zhang, W.; Zhang, B.

2012-01-01

Single-crystal films of TiC (111) have been synthesized at room temperature on Al 2 O 3 (0001) substrates by radio frequency magnetron sputtering using a compound Ti–C target. The substrate temperature and bias were varied to explore the influence of deposition parameters on the crystal structure. Both Al 2 O 3 (0001) and Si (100) substrates were used for epitaxial growth of TiC films. A series of characterizations of TiC films were carried out, including Rutherford backscattering spectroscopy, X-ray diffraction, Raman and X-ray photoelectron spectroscopy. Single-crystal films of TiC (111) on the Al 2 O 3 (0001) were demonstrated. - Highlights: ► Single-crystal films of TiC (111) have been synthesized by RF magnetron sputtering. ► Both temperature and bias affect greatly the TiC crystal structure. ► Al 2 O 3 substrate is much better than Si substrate for TiC epitaxial growth. ► TiC (111) epitaxial film can be grown on Al 2 O 3 (0001) at room temperature.

Tribological properties, corrosion resistance and biocompatibility of magnetron sputtered titanium-amorphous carbon coatings

Science.gov (United States)

Dhandapani, Vishnu Shankar; Subbiah, Ramesh; Thangavel, Elangovan; Arumugam, Madhankumar; Park, Kwideok; Gasem, Zuhair M.; Veeraragavan, Veeravazhuthi; Kim, Dae-Eun

2016-05-01

Amorphous carbon incorporated with titanium (a-C:Ti) was coated on 316L stainless steel (SS) by magnetron sputtering technique to attain superior tribological properties, corrosion resistance and biocompatibility. The morphology, topography and functional groups of the nanostructured a-C:Ti coatings in various concentrations were analyzed using atomic force microscopy (AFM), Raman, X-Ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). Raman and XPS analyses confirmed the increase in sp2 bonds with increasing titanium content in the a-C matrix. TEM analysis confirmed the composite nature of the coating and the presence of nanostructured TiC for Ti content of 2.33 at.%. This coating showed superior tribological properties compared to the other a-C:Ti coatings. Furthermore, electrochemical corrosion studies were performed against stimulated body fluid medium in which all the a-C:Ti coatings showed improved corrosion resistance than the pure a-C coating. Preosteoblasts proliferation and viability on the specimens were tested and the results showed that a-C:Ti coatings with relatively high Ti (3.77 at.%) content had better biocompatibility. Based on the results of this work, highly durable coatings with good biocompatibility could be achieved by incorporation of optimum amount of Ti in a-C coatings deposited on SS by magnetron sputtering technique.

Algan/Gan Hemt By Magnetron Sputtering System

Science.gov (United States)

Garcia Perez, Roman

In this thesis, the growth of the semiconductor materials AlGaN and GaN is achieved by magnetron sputtering for the fabrication of High Electron Mobility Transistors (HEMTs). The study of the deposited nitrides is conducted by spectroscopy, diffraction, and submicron scale microscope methods. The preparation of the materials is performed using different parameters in terms of power, pressure, temperature, gas, and time. Silicon (Si) and Sapphire (Al2O3) wafers are used as substrates. The chemical composition and surface topography of the samples are analyzed to calculate the materials atomic percentages and to observe the devices surface. The instruments used for the semiconductors characterization are X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM), and Atomic Force Microscope (AFM). The project focused its attention on the reduction of impurities during the deposition, the controlled thicknesses of the thin-films, the atomic configuration of the alloy AlxGa1-xN, and the uniformity of the surfaces.

Tribological characterization of TiN coatings prepared by magnetron sputtering

Science.gov (United States)

Makwana, Nishant S.; Chauhan, Kamlesh V.; Sonera, Akshay L.; Chauhan, Dharmesh B.; Dave, Divyeshkumar P.; Rawal, Sushant K.

2018-05-01

Titanium nitride (TiN) coating deposited on aluminium and brass pin substrates using RF reactive magnetron sputtering. The structural properties and surface morphology were characterized by X-ray diffraction (XRD), atomic force microscope (AFM) and field emission scanning electron microscope (FE-SEM). There was formation of (101) Ti2N, (110) TiN2 and (102) TiN0.30 peaks at 3.5Pa, 2Pa and 1.25Pa sputtering pressure respectively. The tribological properties of coating were inspected using pin on disc tribometer equipment. It was observed that TiN coated aluminium and brass pins demonstrated improved wear resistance than uncoated aluminium and brass pins.

Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

OpenAIRE

Rafieian Boroujeni, Damon; Ogieglo, Wojciech; Savenije, Tom; Lammertink, Rob G.H.

2015-01-01

We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties. The initial deposition provided amorphous films that crystallise upon annealing to anatase or rutile, depending on the initial sputtering conditions. Substoichiometric films (TiOx

Contribution to mechanical and crystallographic analysis of molyledenum layers prepared by magnetron cathode sputtering

International Nuclear Information System (INIS)

Bosland, P.

1988-01-01

Molybdenum coatings presenting different compression stresses are elaborated by magnetron cathode sputtering by varying the negative voltage of the substrate during deposition. Stress evolution is accompanied by crystal texture evolution and argon content incorporated in the layers. Crystallite orientation is explained by a phenomenon similar to canalisation observed in ion implantation. In a same deposit each component presents its own deformations different from neighbouring components [fr

Development of low temperature RF magnetron sputtered ITO films on flexible substrate

Energy Technology Data Exchange (ETDEWEB)

Muneshwar, T.P.; Varma, V.; Meshram, N; Soni, S.; Dusane, R.O. [Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology Bombay, Powai, Mumbai 400076 (India)

2010-09-15

Indium tin oxide (ITO) is one of the important materials used as transparent conducting oxide (TCO) layer in thin film solar cells, digital displays and other similar applications. For applications involving flexible polymeric substrates, it is important that deposition of ITO is carried out at near room temperature. This requirement puts constraint on stoichiometry leading to undesired electrical and optical properties. Effect of oxygen partial pressure on ITO films deposited on flexible Kapton {sup registered} by the RF magnetron sputtering is reported in this paper. (author)

The effect of Al intermediate layer on thermal resistance of EB-PVD yttria-stabilized zirconia coatings on titanium substrate

Science.gov (United States)

Panin, Alexey; Panin, Victor; Kazachenok, Marina; Shugurov, Artur; Sinyakova, Elena; Martynov, Sergey; Rusyaev, Andrey; Kasterov, Artur

2017-12-01

The yttria-stabilized zirconia coatings sprayed on titanium substrates by the electron beam physical vapor deposition were subjected to thermal annealing in air at 1000°C for 1, 30 and 60 min. The delamination and fracture of the coatings are studied by the scanning electron microscopy and X-ray diffraction. It is shown that a magnetron sputtered Al interlayer between the coating and the substrate considerably improves the thermal resistance of ceramic coatings.

Impedance study on the corrosion of PVD and CVD titanium nitride coatings

International Nuclear Information System (INIS)

Elsener, B.; Rota, A.; Boehni, H.

1989-01-01

Titanium nitride (TiN) coatings, produced by physical (PVD) or chemical (CVD) vapor deposition techniques are used routinely to improve the wear and corrosion resistance of a surface. The main problem in using TiN as a protective coating in aggressive environements are pores and pinholes in the coating where the substrate is exposed to the electrolyte. In this work, the electrochemical and corrosion behaviour of TiN films on quartz glass, carbon steel, 304 and 316 stainless steel is studied by polarization curves and electrochemical impedance spectroscopy (EIS) in hydrochloric acid. It is shown that the TiN coating can be used successfully only on substrates that passivate easily. On mild steel rapid corrosion takes place at pores in the coating due to the very noble steady state potential of the TiN coating. The interaction of the metallic substrate with the TiN coating is discussed for the two limiting cases mild steel (active) and 316SS (passive). It is shown that the determination of the coating porosity is possible for the active substrate only. On the passive substrate the occurence of an additional time constant in the high frequency region of the spectrum qualitatively indicates the presence of pores. A quality control of the coatings based on this fact might be possible. (author) 15 refs., 6 figs., 2 tabs

Dual Credit/Dual Enrollment and Data Driven Policy Implementation

Science.gov (United States)

Lichtenberger, Eric; Witt, M. Allison; Blankenberger, Bob; Franklin, Doug

2014-01-01

The use of dual credit has been expanding rapidly. Dual credit is a college course taken by a high school student for which both college and high school credit is given. Previous studies provided limited quantitative evidence that dual credit/dual enrollment is directly connected to positive student outcomes. In this study, predictive statistics…

Deposition and characterization of single magnetron deposited Fe:SnO{sub x} coatings

Energy Technology Data Exchange (ETDEWEB)

Kormunda, Martin, E-mail: martin.kormunda@ujep.cz [J.E. Purkinje University, Faculty of Science, Department of Physics, Ceske mladeze 8, 400 96 Usti nad Labem (Czech Republic); Fischer, Daniel; Hertwig, Andreas; Beck, Uwe [BAM Federal Institute for Materials Research and Testing, Division 6 4 Surface Technologies, Unter den Eichen 44-46, 12203 Berlin (Germany); Sebik, Matej; Pavlik, Jaroslav [J.E. Purkinje University, Faculty of Science, Department of Physics, Ceske mladeze 8, 400 96 Usti nad Labem (Czech Republic); Esser, Norbert [Leibniz-Institut für Analytische Wissenschaften — ISAS e.V., Department Berlin, Schwarzschildstr. 12, 12489 Berlin (Germany)

2015-11-30

Coatings deposited by magnetron co-sputtering from a single RF magnetron with a ceramic SnO{sub 2} target with iron inset in argon plasma were studied. The mass spectra of the process identified Sn{sup +} and SnO{sup +} species as the dominant species sputtered from the target, but no SnO{sub 2}{sup +} species were detected. The dominant positive ions in argon plasma are Ar{sup +} species. The only detected negative ions were O{sup −}. Sputtered neutral tin related species were not detected. Iron related species were also not detected because their concentration is below the detection limit. The concentration of iron dopant in the tin oxide coatings was controlled by the RF bias applied on the substrate holder while the discharge pressure also has some influence. The iron concentration was in the range from 0.9 at.% up to 19 at.% increasing with the substrate bias while the sheet resistivity decreases. The stoichiometry ratio of O/(Sn + Fe) in the coatings increased from 1.7 up to 2 in dependence on the substrate bias from floating bias (− 5 V) up to − 120 V of RF self-bias, respectively. The tin in the coatings was mainly bonded in Sn{sup 4+} state and iron was mainly in Fe{sup 2+} state when other tin bonding states were detected only in a small amounts. Iron bonding states in contrary to elemental compositions of the coatings were not influenced by the RF bias applied on the substrate. The coatings showed high transparency in the visible spectral range. However, an increased metallic behavior could be detected by using a higher RF bias for the deposition. The X-ray diffraction patterns and electron microscopy pictures made on the coatings confirmed the presence of an amorphous phase. - Highlights: • RF magnetron sputtering of SnO{sub 2} target with Fe inset in argon investigated by mass spectrometry • Optical properties of Fe doped SnO{sub x} coatings characterized • Analyses of overlapped XPS peaks at a spectrum from Fe doped SnO{sub x} coatings �

Epitaxial growth of "infinite layer” thin films and multilayers by rf magnetron sputtering

OpenAIRE

Fàbrega, L.; Koller, E.; Triscone, J. M.; Fischer, Ø.

2017-01-01

We report on the preparation and characterization of epitaxial ACuO2 (A = Sr, Ca, Ba) thin films and multilayers with the so- called infinite layer (IL) structure, by rf magnetron sputtering. Films and multilayers without Ba have a remarkable crystal quality, whereas those containing this large ion are often multiphased and unstable. In spite of the excellent crystalline quality of these samples, obtaining thin films having both IL structure and displaying superconducting properties has not s...

Overview of recent studies and design changes for the FNAL magnetron ion source

Science.gov (United States)

Bollinger, D. S.; Sosa, A.

2017-08-01

This paper presents several studies and design changes that will eventually be implemented to the Fermi National Accelerator Laboratory (FNAL) magnetron ion source. The topics include tungsten cathode insert, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction. The studies were performed on the FNAL test stand described in [1], with the aim to improve source lifetime, stability, and reducing the amount of tuning needed.

Overview of Recent Studies and Design Changes for the FNAL Magnetron Ion Source

Energy Technology Data Exchange (ETDEWEB)

Bollinger, D. S. [Fermilab; Sosa, A. [Fermilab

2016-09-06

This paper will cover several studies and design changes that will eventually be implemented to the Fermi National Accelerator Laboratory (FNAL) magnetron ion source. The topics include tungsten cathode insert, solenoid gas valves, current controlled arc pulser, cesium boiler redesign, gas mixtures of hydrogen and nitrogen, and duty factor reduction. The studies were performed on the FNAL test stand described in [1], with the aim to improve source lifetime, stability, and reducing the amount of tuning needed.

Deposition of lead-silicate glassy thin coatings by RF magnetron sputtering: Correlation between deposition parameters and electrical and structural properties

International Nuclear Information System (INIS)

Rigato, V.; Maggioni, G.; Boscarino, D.; Della Mea, G.; Univ. di Trento, Mesiano

1996-01-01

Lead-silicate glassy thin films produced by means of Reactive Radio Frequency Magnetron Sputtering have found recent application in the development of MicroStrip Gas Chambers radiation detectors. Here, thin films (100--400 nm) of lead silicate glass have been deposited by RF magnetron sputtering in Ar plasma at different discharge conditions. The interaction of the sputtered species with the gas atoms during the transport process through the discharge region and the kinetics of growth of the films have been investigated as a function of the target composition and of the substrate temperature. This study demonstrates the possibility of controlling the surface electrical resistance of the films in a wide range of values ranging from 10 12 to 10 17 Ω/□ during the film growth

Multilayer stacks obtained by ion assisted EB PVD aimed at thermal barrier coating

Energy Technology Data Exchange (ETDEWEB)

Roos, E.; Maile, K.; Lyutovich, A. [Stuttgart Univ. (DE). Materialpruefungsanstalt (MPA)

2010-07-01

Thermal Barrier Coating (TBC) using Electron Beam Physical Vapour Deposition (EB PVD) is widely implemented, especially for aero-engine turbine blades. Generally, multilayer stacks are used for these aims. For the additional improvement of intermediate layers with graded transitions to the initial Ni-based alloy, the use of accelerated ions in the EBPVD-process is advantageous. The effect of the substrate bias potential, ion current density and deposition temperature on the structure and properties of Ti and Zr intermediate layers are investigated. The morphology of the films is studied using optical microscopy, scanning electron microscopy (SEM) and atomic force microscopy (AFM). It is found that the surface morphology becomes smoother with rising bias potential and decreasing ion current density. Measurements of Vicker's micro-hardness performed on these coatings have shown its increase with higher values of the bias and its reduction with the growing temperature. This effect is caused by the observed decrease in grain size and higher porosity of the films. A multilayer coating system Ni (based substrate)-Si-Si{sub x}Al{sub y}-Al with graded transitions between the layers is obtained using ion assisted EBPVD. Architecture of a multilayer stack for TBC with graded transitions is proposed. (orig.)

High temperature oxidation behavior of hafnium modified NiAl bond coat in EB-PVD thermal barrier coating system

Energy Technology Data Exchange (ETDEWEB)

Guo Hongbo; Sun Lidong; Li Hefei [Department of Material Science and Engineering, Beijing University of Aeronautics and Astronautics, No.37 Xueyuan Road, Beijing 100083 (China); Gong Shengkai [Department of Material Science and Engineering, Beijing University of Aeronautics and Astronautics, No.37 Xueyuan Road, Beijing 100083 (China)], E-mail: gongsk@buaa.edu.cn

2008-06-30

NiAl coatings doped with 0.5 at.% and 1.5 at.% Hf were produced by co-evaporation of NiAl and Hf ingots by electron beam physical vapor deposition (EB-PVD), respectively. The addition of 0.5 at.% Hf significantly improved the cyclic oxidation resistance of the NiAl coating. The TGO layer in the 1.5 at.% Hf doped NiAl coating is straight; while that in the 0.5 at.% Hf doped coating became undulated after thermal cycling. The doped NiAl thermal barrier coatings (TBCs) revealed improved thermal cycling lifetimes at 1423 K, compared to the undoped TBC. Failure of the 0.5 at.% Hf doped TBC occurred by cracking at the interface between YSZ topcoat and bond coat, while the 1.5 at.% Hf doped TBC cracked at the interface between bond coat and substrate.

Electrochemical characterization of silicon/graphene/MWCNT hybrid lithium-ion battery anodes produced via RF magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Toçoğlu, Ubeyd, E-mail: utocoglu@sakarya.edu.tr; Hatipoğlu, Gizem; Alaf, Miraç; Kayış, Fuat; Akbulut, Hatem

2016-12-15

Graphical abstract: Silicon/graphene/MWCNT hybrid composite anodes were produced via RF magnetron sputtering technique. CR2016 type coin cells were assembled for electrochemical characterization of anodes. Electrochemical characterizations of anodes were conducted via galvanostatic charge/discharge, cyclic voltammetry and electrochemical impedance spectroscopy techniques. - Highlights: • Silicon/graphene/MWCNT hybrid negative lithium ion battery anodes were produced via magnetron sputtering. • Structural and electrochemical characterizations of composite anodes were conducted comprehensively. • The capacity values exhibited by composite anodes were found to be almost more than two times compared to thin film anodes after 100 cycles. - Abstract: In this study it was aimed to enhance cycling performance of silicon lithium ion battery anodes via producing flexible Silicon/Graphene/MWCNT composite structures. The volumetric expansions, which are the primary obstacle that hinders the practical usage of silicon anodes, were tried to suppress using flexible graphene/MWCNT paper substrates. Moreover to achieve lightweight and high electrical conductive anodes, the advantage of graphene was aimed to be exploited. Silicon/graphene/MWCNT flexible composite anodes were produced via radio frequency (RF) magnetron sputtering technique. Graphene/MWCNT papers were produced with vacuum filtration technique as substrate for sputtering process. At coating process of papers constant sputtering power was applied. Phase analysis was conducted with X-ray diffraction (XRD) technique and Raman spectroscopy. Field emission scanning electron microscopy (FESEM). Cyclic voltammetry (CV) tests were carried out to reveal reversible reactions between silicon and lithium. Galvanostatic charge/discharge technique was employed to determine the cyclic performance of anodes. Electrochemical impedance spectroscopy technique was used to understand the relation between cyclic performance and

Electrochemical characterization of silicon/graphene/MWCNT hybrid lithium-ion battery anodes produced via RF magnetron sputtering

International Nuclear Information System (INIS)

Toçoğlu, Ubeyd; Hatipoğlu, Gizem; Alaf, Miraç; Kayış, Fuat; Akbulut, Hatem

2016-01-01

Graphical abstract: Silicon/graphene/MWCNT hybrid composite anodes were produced via RF magnetron sputtering technique. CR2016 type coin cells were assembled for electrochemical characterization of anodes. Electrochemical characterizations of anodes were conducted via galvanostatic charge/discharge, cyclic voltammetry and electrochemical impedance spectroscopy techniques. - Highlights: • Silicon/graphene/MWCNT hybrid negative lithium ion battery anodes were produced via magnetron sputtering. • Structural and electrochemical characterizations of composite anodes were conducted comprehensively. • The capacity values exhibited by composite anodes were found to be almost more than two times compared to thin film anodes after 100 cycles. - Abstract: In this study it was aimed to enhance cycling performance of silicon lithium ion battery anodes via producing flexible Silicon/Graphene/MWCNT composite structures. The volumetric expansions, which are the primary obstacle that hinders the practical usage of silicon anodes, were tried to suppress using flexible graphene/MWCNT paper substrates. Moreover to achieve lightweight and high electrical conductive anodes, the advantage of graphene was aimed to be exploited. Silicon/graphene/MWCNT flexible composite anodes were produced via radio frequency (RF) magnetron sputtering technique. Graphene/MWCNT papers were produced with vacuum filtration technique as substrate for sputtering process. At coating process of papers constant sputtering power was applied. Phase analysis was conducted with X-ray diffraction (XRD) technique and Raman spectroscopy. Field emission scanning electron microscopy (FESEM). Cyclic voltammetry (CV) tests were carried out to reveal reversible reactions between silicon and lithium. Galvanostatic charge/discharge technique was employed to determine the cyclic performance of anodes. Electrochemical impedance spectroscopy technique was used to understand the relation between cyclic performance and

Surface composition of magnetron sputtered Pt-Co thin film catalyst for proton exchange membrane fuel cells

Energy Technology Data Exchange (ETDEWEB)

Vorokhta, Mykhailo, E-mail: vorohtam@gmail.com [Charles University in Prague, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holešovičkách 2, 18000 Prague (Czech Republic); Khalakhan, Ivan; Václavů, Michal [Charles University in Prague, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holešovičkách 2, 18000 Prague (Czech Republic); Kovács, Gábor; Kozlov, Sergey M. [Departament de Química Física and Institut de Química Teòrica i Computacional (IQTCUB), Universitat de Barcelona, c/ Martí i Franquès 1, 08028 Barcelona (Spain); Kúš, Peter; Skála, Tomáš; Tsud, Natalia; Lavková, Jaroslava [Charles University in Prague, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holešovičkách 2, 18000 Prague (Czech Republic); Potin, Valerie [Laboratoire Interdisciplinaire Carnot de Bourgogne, UMR 6303 CNRS-Université Bourgogne, 9 Av. A. Savary, BP 47870, F-21078 Dijon Cedex (France); and others

2016-03-01

Graphical abstract: - Highlights: • Nanostructured Pt-Co thin catalyst films were grown on carbon by magnetron sputtering. • The surface composition of the nanostructured Pt-Co films was investigated by surface analysis techniques. • We carried out modeling of Pt-Co nanoalloys by computational methods. • Both experiment and modeling based on density functional theory showed that the surface of Pt-Co nanoparticles is almost exclusively composed of Pt atoms. - Abstract: Recently we have tested a magnetron sputtered Pt-Co catalyst in a hydrogen-fed proton exchange membrane fuel cell and showed its high catalytic activity for the oxygen reduction reaction. Here we present further investigation of the magnetron sputtered Pt-Co thin film catalyst by both experimental and theoretical methods. Scanning electron microscopy and transmission electron microscopy experiments confirmed the nanostructured character of the catalyst. The surface composition of as-deposited and annealed at 773 K Pt-Co films was investigated by surface analysis techniques, such as synchrotron radiation photoelectron spectroscopy and X-ray photoelectron spectroscopy. Modeling based on density functional theory showed that the surface of 6 nm large 1:1 Pt-Co nanoparticles is almost exclusively composed of Pt atoms (>90%) at typical operation conditions and the Co content does not exceed 20% at 773 K, in agreement with the experimental characterization of such films annealed in vacuum. According to experiment, the density of valence states of surface atoms in Pt-Co nanostructures is shifted by 0.3 eV to higher energies, which can be associated with their higher activity in the oxygen reduction reaction. The changes in electronic structure caused by alloying are also reflected in the measured Pt 4f, Co 3p and Co 2p photoelectron peak binding energies.

Determination of the sputter rate variation pattern of a silicon carbide target for radio frequency magnetron sputtering using optical transmission measurements

International Nuclear Information System (INIS)

Galvez de la Puente, G.; Guerra Torres, J.A.; Erlenbach, O.; Steidl, M.; Weingaertner, R.; De Zela, F.; Winnacker, A.

2010-01-01

We produce amorphous silicon carbide thin films (a-SiC) by radio frequency (rf) magnetron sputtering from SiC bulk target. We present the emission pattern of the rf magnetron with SiC target as a function of process parameters, like target sample distance, rf power, sputtering rate and process gas pressure. The emission pattern is determined by means of thickness distribution of the deposited a-SiC films obtained from optical transmission measurements using a slightly improved method of Swanepoel concerning the determination of construction of the envelopes in the interference pattern of the transmission spectra. A calibration curve is presented which allows the conversion of integrated transmission to film thickness. Holding constant a set of process parameters and only varying the target sample distance the emission pattern of the rf magnetron with SiC target was determined, which allowed us to predict the deposition rate distribution for a wide range of process parameters and target geometry. In addition, we have found that the transmission spectra of the a-SiC films change with time and saturate after approximately 10 days. Within this process no change in thickness is involved, so that the determination of thickness using transmission data is justified.

Microstructural variation in titanium oxide thin films deposited by DC magnetron sputtering

International Nuclear Information System (INIS)

Pandian, Ramanathaswamy; Natarajan, Gomathi; Kamruddin, M.; Tyagi, A.K.

2013-01-01

We report on the microstructural evolution of titanium oxide thin films deposited by reactive DC magnetron sputtering using titanium metal target. By varying the ratio of sputter-gas mixture containing argon, oxygen and nitrogen various phases of titanium oxide, almost pure rutile, rutile-rich and anatase-rich nano-crystalline, were deposited on Si substrates at room temperature. Using high-resolution scanning electron microscopy, X-ray diffraction and micro-Raman techniques the microstructure of the films were revealed. The relationship between the microstructure of the films and the oxygen partial pressure during sputtering is discussed

Reactive magnetron sputtering of N-doped carbon thin films on quartz glass for transmission photocathode applications

Science.gov (United States)

Balalykin, N. I.; Huran, J.; Nozdrin, M. A.; Feshchenko, A. A.; Kobzev, A. P.; Sasinková, V.; Boháček, P.; Arbet, J.

2018-03-01

N-doped carbon thin films were deposited on a silicon substrate and quartz glass by RF reactive magnetron sputtering using a carbon target and an Ar+N2 gas mixture. During the magnetron sputtering, the substrate holder temperatures was kept at 800 °C. The carbon film thickness on the silicon substrate was about 70 nm, while on the quartz glass it was in the range 15 nm – 60 nm. The elemental concentration in the films was determined by RBS and ERD. Raman spectroscopy was used to evaluate the intensity ratios I D/I G of the D and G peaks of the carbon films. The transmission photocathodes prepared were placed in the hollow-cathode assembly of a Pierce-structure DC gun to produce photoelectrons. The quantum efficiency (QE) was calculated from the laser energy and cathode charge measured. The properties of the transmission photocathodes based on semitransparent N-doped carbon thin films on quartz glass and their potential for application in DC gun technology are discussed.

Investigation of Rising-Sun Magnetrons Operated at Relativistic Voltages Using Three Dimensional Particle-in-Cell Simulation

International Nuclear Information System (INIS)

Lemke, R.W.; Genoni, T.C.; Spencer, T.A.

1999-01-01

This work is an attempt to elucidate effects that may limit efficiency in magnetrons operated at relativistic voltages (V ∼ 500 kV). Three-dimensional particle-in-cell simulation is used to investigate the behavior of 14 and 22 cavity, cylindrical, rising-sun magnetrons. Power is extracted radially through a single iris located at the end of every other cavity. Numerical results show that in general output power and efficiency increase approximately linearly with increasing iris width (decreasing vacuum Q) until the total Q becomes too low for stable oscillation in the n-mode to be maintained. Beyond this point mode competition and/or switching occur and efficiency decreases. Results reveal that the minimum value of Q (maximum efficiency) that can be achieved prior to the onset of mode competition is significantly affected by the magnitude of the 0-space-harmonic of the π-mode, a unique characteristic of rising-suns, and by the magnitude of the electron current density (space-charge effects). By minimizing these effects, up to 3.7 GW output power has been produced at an efficiency of 40%

Effect of interelectrode distance on dc magnetron current-pressure characteristics

Science.gov (United States)

Mankelevich, Yu A.; Pal, A. F.; Ryabinkin, A. N.; Serov, A. O.

2018-01-01

The current-pressure (I-P) non-monotonic characteristic in the magnetron discharge dc in argon at different interelectrode distances was investigated. The ion spatial distribution was obtained with optical emission spectroscopy and the characteristic dimensions of the discharge structure in near cathode region were determined. It is shown that decreasing the distance between electrodes does not affect the shape and position of the nonmonotonic part of I-P characteristic until this distance become comparable with the dimensions of the ionization region near cathode. The existence of non-monotonic part of I-P characteristic is determined by the processes in the near cathode region and is probably unrelated with the cold electron transfer in the rest of the plasma.

Urea impedimetric biosensor based on reactive RF magnetron sputtered zinc oxide nanoporous transducer

International Nuclear Information System (INIS)

Mozaffari, Sayed Ahmad; Rahmanian, Reza; Abedi, Mohammad; Amoli, Hossein Salar

2014-01-01

Graphical abstract: - Highlights: • Application and optimization of reactive RF magnetron sputtering for homogeneous nanoporous ZnO thin film formation. • Exploiting nanoporous ZnO thin film as a good porous framework with large surface area/volume for having stable immobilized enzyme with minimum loss of activity. • Application of impedimetric assessment for urea biosensing due to its rapidity, sensitivity, and repeatability. - Abstract: Uniform sputtered nanoporous zinc oxide (Nano-ZnO) thin film on the conductive fluorinated-tin oxide (FTO) layer was applied to immobilize urease enzyme (Urs) for urea detection. Highly uniform nanoporous ZnO thin film were obtained by reactive radio frequency (RF) magnetron sputtering system at the optimized instrumental deposition conditions. Characterization of the surface morphology and roughness of ZnO thin film by field emission-scanning electron microscopy (FE-SEM) exhibits cavities of nanoporous film as an effective biosensing area for enzyme immobilization. Step by step monitoring of FTO/Nano-ZnO/Urs biosensor fabrication were performed using electrochemical methods such as cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) techniques. Fabricated FTO/Nano-ZnO/Urs biosensor was used for urea determination using EIS experiments. The impedimetric results show high sensitivity for urea detection within 0.83–23.24 mM and limit of detection as 0.40 mM

Structure and morphology of magnetron sputter deposited ultrathin ZnO films on confined polymeric template

Science.gov (United States)

Singh, Ajaib; Schipmann, Susanne; Mathur, Aakash; Pal, Dipayan; Sengupta, Amartya; Klemradt, Uwe; Chattopadhyay, Sudeshna

2017-08-01

The structure and morphology of ultra-thin zinc oxide (ZnO) films with different film thicknesses on confined polymer template were studied through X-ray reflectivity (XRR) and grazing incidence small angle X-ray scattering (GISAXS). Using magnetron sputter deposition technique ZnO thin films with different film thicknesses (weight of polystyrene). The detailed internal structure, along the surface/interfaces and the growth direction of the system were explored in this study, which provides insight into the growth procedure of ZnO on confined polymer and reveals that a thin layer of ZnO, with very low surface and interface roughness, can be grown by DC magnetron sputtering technique, with approximately full coverage (with bulk like electron density) even in nm order of thickness, in 2-7 nm range on confined polymer template, without disturbing the structure of the underneath template. The resulting ZnO-polystyrene hybrid systems show strong ZnO near band edge (NBE) and deep-level (DLE) emissions in their room temperature photoluminescence spectra, where the contribution of DLE gets relatively stronger with decreasing ZnO film thickness, indicating a significant enhancement of surface defects because of the greater surface to volume ratio in thinner films.

Characterization of sp3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy

Science.gov (United States)

Zdunek, Krzysztof; Chodun, Rafał; Wicher, Bartosz; Nowakowska-Langier, Katarzyna; Okrasa, Sebastian

2018-04-01

This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2 kV and a power supply system equipped with 25/50 μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp3/sp2 bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp3 bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp3/sp2 ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp3 phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed.

Characterization of sp3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy.

Science.gov (United States)

Zdunek, Krzysztof; Chodun, Rafał; Wicher, Bartosz; Nowakowska-Langier, Katarzyna; Okrasa, Sebastian

2018-04-05

This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2kV and a power supply system equipped with 25/50μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp 3 /sp 2 bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp 3 bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp 3 /sp 2 ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp 3 phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed. Copyright © 2018 Elsevier B.V. All rights reserved.

Investigation of DC magnetron-sputtered TiO2 coatings: Effect of coating thickness, structure, and morphology on photocatalytic activity

DEFF Research Database (Denmark)

Daviðsdóttir, Svava; Shabadi, Rajashekhara; Galca, Aurelian Catalin

2014-01-01

The photocatalytic performance of magnetron-sputtered titanium dioxide (TiO2) coatings of different thickness in anatase crystalline structure deposited on aluminium 1050 alloy substrates was investigated using a combination of photo-electrochemistry, methylene blue decomposition, and microscopic...

Composite SiOx/hydrocarbon plasma polymer films prepared by RF magnetron sputtering of SiO2 and polyimide

Czech Academy of Sciences Publication Activity Database

Drabik, M.; Kousal, J.; Pinosh, Y.; Choukourov, A.; Biederman, H.; Slavínská, D.; Macková, Anna; Boldyryeva, Hanna; Pešička, J.

2007-01-01

Roč. 81, č. 7 (2007), s. 920-927 ISSN 0042-207X Institutional research plan: CEZ:AV0Z10480505 Keywords : composite films * magnetron * sputtering * polyimide * SiO2 Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.881, year: 2007

Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber

Czech Academy of Sciences Publication Activity Database

Pokorný, Petr; Musil, Jindřich; Fitl, Přemysl; Novotný, Michal; Lančok, Ján; Bulíř, Jiří

2015-01-01

Roč. 12, č. 5 (2015), s. 416-421 ISSN 1612-8850 R&D Projects: GA ČR(CZ) GAP108/11/1298; GA ČR(CZ) GAP108/11/1312; GA ČR(CZ) GAP108/11/0958; GA ČR(CZ) GA14-10279S Institutional support: RVO:68378271 Keywords : contamination * low-pressure discharges * magnetron * metallic films * sputtering Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.713, year: 2015

Composite TiO2/hydrocarbon plasma polymer films prepared by magnetron sputtering of TiO2 and poly(propylene)

Czech Academy of Sciences Publication Activity Database

Drabik, M.; Hanuš, J.; Kousal, J.; Choukourov, A.; Biederman, H.; Slavínská, D.; Macková, Anna; Pešička, J.

2007-01-01

Roč. 4, č. 6 (2007), s. 654-663 ISSN 1612-8850 Institutional research plan: CEZ:AV0Z10480505 Keywords : composite thin films * magnetron * poly(propylene) (PP) Subject RIV: BE - Theoretical Physics Impact factor: 2.132, year: 2007

Structure and morphology of magnetron sputter deposited ultrathin ZnO films on confined polymeric template

Energy Technology Data Exchange (ETDEWEB)

Singh, Ajaib [Discipline of Metallurgy Engineering and Materials Science, Indian Institute of Technology Indore, Indore 453552 (India); Schipmann, Susanne [II. Insatitute of Physics and JARA-FIT, RWTH Aachen University, 52056 Aachen (Germany); Mathur, Aakash; Pal, Dipayan [Discipline of Metallurgy Engineering and Materials Science, Indian Institute of Technology Indore, Indore 453552 (India); Sengupta, Amartya [Department of Physics, Indian Institute of Technology Delhi, Delhi 110016 (India); Klemradt, Uwe [II. Insatitute of Physics and JARA-FIT, RWTH Aachen University, 52056 Aachen (Germany); Chattopadhyay, Sudeshna, E-mail: sudeshna@iiti.ac.in [Discipline of Metallurgy Engineering and Materials Science, Indian Institute of Technology Indore, Indore 453552 (India); Discipline of Physics, Indian Institute of Technology Indore, Indore 453552 (India); Centre for Biosciences and Biomedical Engineering, Indian Institute of Technology Indore, Indore 453552 (India)

2017-08-31

Highlights: • Ultra-thin ZnO films grown on confined polymeric (polystyrene, PS) template. • XRR and GISAXS explore the surface/interfaces structure and morphology of ZnO/PS. • Insights into the growth mechanism of magnetron sputtered ZnO thin film on PS template. • Nucleated disk-like cylindrical particles are the basis of the formation of ZnO layers. • Effect of ZnO film thickness on room temperature PL spectra in ZnO/PS systems. - Abstract: The structure and morphology of ultra-thin zinc oxide (ZnO) films with different film thicknesses on confined polymer template were studied through X-ray reflectivity (XRR) and grazing incidence small angle X-ray scattering (GISAXS). Using magnetron sputter deposition technique ZnO thin films with different film thicknesses (<10 nm) were grown on confined polystyrene with ∼2R{sub g} film thickness, where R{sub g} ∼ 20 nm (R{sub g} is the unperturbed radius of gyration of polystyrene, defined by R{sub g} = 0.272 √M{sub 0}, and M{sub 0} is the molecular weight of polystyrene). The detailed internal structure, along the surface/interfaces and the growth direction of the system were explored in this study, which provides insight into the growth procedure of ZnO on confined polymer and reveals that a thin layer of ZnO, with very low surface and interface roughness, can be grown by DC magnetron sputtering technique, with approximately full coverage (with bulk like electron density) even in nm order of thickness, in 2–7 nm range on confined polymer template, without disturbing the structure of the underneath template. The resulting ZnO-polystyrene hybrid systems show strong ZnO near band edge (NBE) and deep-level (DLE) emissions in their room temperature photoluminescence spectra, where the contribution of DLE gets relatively stronger with decreasing ZnO film thickness, indicating a significant enhancement of surface defects because of the greater surface to volume ratio in thinner films.

Nitrogen Atom Energy Distributions in a Hollow-cathode Planar Sputtering Magnetron

International Nuclear Information System (INIS)

Ruzic, D.N.; Goeckner, M.J.; Cohen, S.A.; Wang, Zhehui

1999-01-01

Energy distributions of N atoms in a hollow-cathode planar sputtering magnetron were obtained by use of optical emission spectroscopy. A characteristic line, N I 8216.3 , well-separated from molecular nitrogen emission bands, was identified. Jansson's nonlinear spectral deconvolution method, refined by minimization of χ w ampersand sup2; , was used to obtain the optimal deconvolved spectra. These showed nitrogen atom energies from 1 eV to beyond 500 eV. Based on comparisons with VFTRIM results, we propose that the energetic N atoms are generated from N 2 + ions after these ions are accelerated through the sheath and dissociatively reflect from the cathode

Venting temperature determines surface chemistry of magnetron sputtered TiN films

Energy Technology Data Exchange (ETDEWEB)

Greczynski, G. [Thin Film Physics Division, Department of Physics (IFM), Linköping University, SE-581 83 Linköping (Sweden); Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen (Germany); Mráz, S.; Schneider, J. M. [Materials Chemistry, RWTH Aachen University, Kopernikusstr. 10, D-52074 Aachen (Germany); Hultman, L. [Thin Film Physics Division, Department of Physics (IFM), Linköping University, SE-581 83 Linköping (Sweden)

2016-01-25

Surface properties of refractory ceramic transition metal nitride thin films grown by magnetron sputtering are essential for resistance towards oxidation necessary in all modern applications. Here, typically neglected factors, including exposure to residual process gases following the growth and the venting temperature T{sub v}, each affecting the surface chemistry, are addressed. It is demonstrated for the TiN model materials system that T{sub v} has a substantial effect on the composition and thickness-evolution of the reacted surface layer and should therefore be reported. The phenomena are also shown to have impact on the reliable surface characterization by x-ray photoelectron spectroscopy.

A study of the transient plasma potential in a pulsed bi-polar dc magnetron discharge

International Nuclear Information System (INIS)

Bradley, J W; Karkari, S K; Vetushka, A

2004-01-01

The temporal evolution of the plasma potential, V p , in a pulsed dc magnetron plasma has been determined using the emissive probe technique. The discharge was operated in the 'asymmetric bi-polar' mode, in which the discharge voltage changes polarity during part of the pulse cycle. The probe measurements, with a time-resolution of 20 ns or better, were made along a line above the racetrack, normal to the plane of the cathode target, for a fixed frequency (100 kHz), duty cycle (50%), argon pressure (0.74 Pa) and discharge power (583 W). At all the measured positions, V p was found to respond to the large and rapid changes in the cathode voltage, V d , during the different phases of the pulse cycle, with V p always more positive than V d . At a typical substrate position (>80 mm from the target), V p remains a few volts above the most positive surface in the discharge at all times. In the 'on' phase of the pulse, the measurements show a significant axial electric field is generated in the plasma, with the plasma potential dropping by a total of about 30 V over a distance of 70 mm, from the bulk plasma to a position close to the beginning of the cathode fall. This is consistent with measurements made in the dc magnetron. During the stable 'reverse' phase of the discharge, for distances greater than 18 mm from the target, the axial electric field is found to collapse, with V p elevated uniformly to about 3 V above V d . Between the target and this field-free region an ion sheath forms, and the current flowing to the target is still an ion current in this 'reverse' period. During the initial 200 ns of the voltage 'overshoot' phase (between 'on' and 'reverse' phases), V d reached a potential of +290 V; however, close to the target, V p was found to attain a much higher value, namely +378 V. Along the line of measurement, the axial electric field reverses in direction in this phase, and an electron current of up to 9 A flows to the target. The spatial and temporal

Electrical and optical properties of reactive dc magnetron sputtered silver-doped indium oxide thin films: role of oxygen

International Nuclear Information System (INIS)

Subrahmanyam, A.; Barik, U.K.

2006-01-01

Silver-doped indium oxide thin films have been prepared on glass and quartz substrates at room temperature (300 K) by a reactive dc magnetron sputtering technique using an alloy target of pure indium and silver (80:20 at. %). During sputtering, the oxygen flow rates are varied in the range 0.00-2.86 sccm keeping the magnetron power constant at 40 W. The resistivity of these films is in the range 10 0 -10 -3 Ωcm and they show a negative temperature coefficient of resistivity. The films exhibit p-type conductivity at an oxygen flow rate of 1.71 sccm. The work function of these silver-indium oxide films has been measured by a Kelvin probe technique. The refractive index of the films (at 632.8 nm) varies in the range 1.13-1.20. Silver doping in indium oxide narrows the band gap of indium oxide (3.75 eV). (orig.)

Electrical and optical properties of reactive dc magnetron sputtered silver-doped indium oxide thin films: role of oxygen

Energy Technology Data Exchange (ETDEWEB)

Subrahmanyam, A; Barik, U K [Indian Institute of Technology Madras, Semiconductor Physics Laboratory, Department of Physics, Chennai (India)

2006-07-15

Silver-doped indium oxide thin films have been prepared on glass and quartz substrates at room temperature (300 K) by a reactive dc magnetron sputtering technique using an alloy target of pure indium and silver (80:20 at. %). During sputtering, the oxygen flow rates are varied in the range 0.00-2.86 sccm keeping the magnetron power constant at 40 W. The resistivity of these films is in the range 10{sup 0}-10{sup -3} {omega}cm and they show a negative temperature coefficient of resistivity. The films exhibit p-type conductivity at an oxygen flow rate of 1.71 sccm. The work function of these silver-indium oxide films has been measured by a Kelvin probe technique. The refractive index of the films (at 632.8 nm) varies in the range 1.13-1.20. Silver doping in indium oxide narrows the band gap of indium oxide (3.75 eV). (orig.)

GEP-based method to formulate adhesion strength and hardness of Nb PVD coated on Ti-6Al-7Nb aimed at developing mixed oxide nanotubular arrays.

Science.gov (United States)

Rafieerad, A R; Bushroa, A R; Nasiri-Tabrizi, B; Fallahpour, A; Vadivelu, J; Musa, S N; Kaboli, S H A

2016-08-01

PVD process as a thin film coating method is highly applicable for both metallic and ceramic materials, which is faced with the necessity of choosing the correct parameters to achieve optimal results. In the present study, a GEP-based model for the first time was proposed as a safe and accurate method to predict the adhesion strength and hardness of the Nb PVD coated aimed at growing the mixed oxide nanotubular arrays on Ti67. Here, the training and testing analysis were executed for both adhesion strength and hardness. The optimum parameter combination for the scratch adhesion strength and micro hardness was determined by the maximum mean S/N ratio, which was 350W, 20 sccm, and a DC bias of 90V. Results showed that the values calculated in the training and testing in GEP model were very close to the actual experiments designed by Taguchi. The as-sputtered Nb coating with highest adhesion strength and microhardness was electrochemically anodized at 20V for 4h. From the FESEM images and EDS results of the annealed sample, a thick layer of bone-like apatite was formed on the sample surface after soaking in SBF for 10 days, which can be connected to the development of a highly ordered nanotube arrays. This novel approach provides an outline for the future design of nanostructured coatings for a wide range of applications. Copyright © 2016 Elsevier Ltd. All rights reserved.

Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina

Czech Academy of Sciences Publication Activity Database

Pokorný, Petr; Bulíř, Jiří; Lančok, Ján; Musil, Jindřich; Novotný, Michal

2010-01-01

Roč. 7, č. 11 (2010), s. 910-914 ISSN 1612-8850 R&D Projects: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324 Institutional research plan: CEZ:AV0Z10100522 Keywords : aluminium oxide * ion-energy distribution function * magnetron * mass spectrometry * pulsed discharges Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.643, year: 2010

Microstructure and properties of TiAlSiN coatings prepared by hybrid PVD technology

International Nuclear Information System (INIS)

Yu Donghai; Wang Chengyong; Cheng Xiaoling; Zhang Fenglin

2009-01-01

TiAlSiN coatings with different Si content were prepared by hollow cathode discharge (HCD) and mid-frequency magnetron sputtering (MFMS) hybrid coating deposition technology. The chemical composition, microstructure, mechanical properties of these coatings were systematically investigated by means of energy dispersive spectrometry (EDS), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), nanoindentation measurement, scratch and high speed milling hardened steel tests. The coatings prepared by this method showed the structure of crystalline phase was corresponding to that of TiAlN, however, different preferred orientation with addition of Si. Proper content of Si into TiAlN led to increase of microhardness and adhesion. TiAlSiN coated end mill with Si content of 4.78 at.% had the least flank wear, which was improved about 20% milling distance than TiAlN coated end mill.

Microstructure and properties of TiAlSiN coatings prepared by hybrid PVD technology

Energy Technology Data Exchange (ETDEWEB)

Yu Donghai [Faculty of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006 (China); Wang Chengyong, E-mail: cywang@gdut.edu.c [Faculty of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006 (China); Cheng Xiaoling; Zhang Fenglin [Faculty of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006 (China)

2009-07-01

TiAlSiN coatings with different Si content were prepared by hollow cathode discharge (HCD) and mid-frequency magnetron sputtering (MFMS) hybrid coating deposition technology. The chemical composition, microstructure, mechanical properties of these coatings were systematically investigated by means of energy dispersive spectrometry (EDS), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), nanoindentation measurement, scratch and high speed milling hardened steel tests. The coatings prepared by this method showed the structure of crystalline phase was corresponding to that of TiAlN, however, different preferred orientation with addition of Si. Proper content of Si into TiAlN led to increase of microhardness and adhesion. TiAlSiN coated end mill with Si content of 4.78 at.% had the least flank wear, which was improved about 20% milling distance than TiAlN coated end mill.

Magnetron with flux switching cathode and method of operation

Science.gov (United States)

Aaron, D.B.; Wiley, J.D.

1989-09-12

A magnetron sputtering apparatus is formed with a plurality of cells each for generating an independent magnetic field within a different region in the chamber of the apparatus. Each magnetic field aids in maintaining an ion plasma in the respective region of the chamber. One of a plurality of sputtering material targets is positioned on an electrode adjacent to each region so that said ions strike the target ejecting some of the target material. By selectively generating each magnetic field, the ion plasma may be moved from region to region to sputter material from different targets. The sputtered material becomes deposited on a substrate mounted on another electrode within the chamber. The duty cycle of each cell can be dynamically varied during the deposition to produce a layer having a graded composition throughout its thickness. 5 figs.

Structural and optical properties of (Sr,Ba)2SiO4:Eu2+ thin films grown by magnetron sputtering

International Nuclear Information System (INIS)

Li, Leliang; Zheng, Jun; Zuo, Yuhua; Cheng, Buwen; Wang, Qiming

2014-01-01

(Sr,Ba) 2 SiO 4 :Eu 2+ thin films were deposited on Si at different substrate temperatures by magnetron sputtering. The morphology and crystalline phases of the films were studied by scanning electron microscopy (SEM) and X-ray diffraction (XRD) measurements, respectively. The silicate crystal phase was presented when films were annealed above 900 °C and the annealing temperature had great impact on the film morphology. The samples annealed at 1000 °C in a non-reducing atmosphere for 30 s show intense room temperature Eu 2+ emission. These findings may open a promising way to prepare efficient phosphor thin films for on-chip light emitting diodes application. - Highlights: • The (Sr, Ba) 2 SiO 4 :Eu 2+ films are fabricated by magnetron sputtering. • A very strong RT PL emission at 540 nm is achieved. • The morphology and optical properties dependent on temperature are studied

Study of deposition rae coating of Ag thin films by magnetron sputtering

International Nuclear Information System (INIS)

Ghanati, M.; Zendehnam, A.

2003-01-01

Exact knowledge about deposition rate and its distribution and variation of them with respect to coating parameters (Gas pressure, Distance, discharge current,..) is very vital. In this experimental research coating of Ag thin films by magnetron sputtering have been carried out over Ar pressure range of 10 -2 -10 -1 mbar, and discharge current up to 1000 m.A, and distance between glass substrates to silver target (Cathode) was changed from 5 to 15 cm. The obtained results have been investigated by help of computer curve fitting, and these studies show a very good agreement for the conditions used in this work

Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas

International Nuclear Information System (INIS)

Andersson, Joakim; Ni, Pavel; Anders, André

2013-01-01

Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side-on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation

Hetero-epitaxial growth of TiC films on MgO(001) at 100 °C by DC reactive magnetron sputtering

International Nuclear Information System (INIS)

Braic, M.; Zoita, N.C.; Danila, M.; Grigorescu, C.E.A.; Logofatu, C.

2015-01-01

Hetero-epitaxial TiC thin films were deposited at 100 °C on MgO(001) by DC reactive magnetron sputtering in a mixture of Ar and CH 4 . The 62 nm thick films were analyzed for elemental composition and chemical bonding by Auger electron spectroscopy, X-ray photoelectron spectroscopy and micro-Raman spectroscopy. The crystallographic structure investigation by high resolution X-ray diffraction revealed that the films consist of two layers: an interface partially strained epilayer with high crystalline quality, and a relaxed layer, formed by columnar grains, maintaining the epitaxial relationship with the substrate. The films presented smooth surfaces (RMS roughness ~ 0.55 nm), with circular equi-sized grains/crystallites, as observed by atomic force microscopy. The Hall measurements in Van der Pauw geometry revealed relatively high resistivity value ~ 620 μΩ cm, ascribed to electron scattering on interfaces, on grain boundaries and on different defects/dislocations. - Highlights: • Hetero-epitaxial TiC 0.84 thin films were grown on MgO(001) at 100 °C by magnetron sputtering. • 62 nm thick films were synthesized by magnetron sputtering, using Ti, Ar and CH 4 . • The film comprises a partially strained interface epilayer and a relaxed top layer. • Both layers preserve the epitaxial relationship with the substrate. • Low RMS surface roughness ~ 0.55 nm and grains with mean lateral size of ~ 38.5 nm were observed

Hetero-epitaxial growth of TiC films on MgO(001) at 100 °C by DC reactive magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Braic, M. [National Institute for Optoelectronics, 409 Atomistilor St., 077125 Magurele (Romania); Zoita, N.C., E-mail: cnzoita@inoe.ro [National Institute for Optoelectronics, 409 Atomistilor St., 077125 Magurele (Romania); Danila, M. [National Institute for Research and Development in Microtechnology, 126A Erou Iancu Nicolae Blvd., 077190 Bucharest (Romania); Grigorescu, C.E.A. [National Institute for Optoelectronics, 409 Atomistilor St., 077125 Magurele (Romania); Logofatu, C. [National Institute of Materials Physics, 105 bis Atomistilor St., 077125 Magurele (Romania)

2015-08-31

Hetero-epitaxial TiC thin films were deposited at 100 °C on MgO(001) by DC reactive magnetron sputtering in a mixture of Ar and CH{sub 4}. The 62 nm thick films were analyzed for elemental composition and chemical bonding by Auger electron spectroscopy, X-ray photoelectron spectroscopy and micro-Raman spectroscopy. The crystallographic structure investigation by high resolution X-ray diffraction revealed that the films consist of two layers: an interface partially strained epilayer with high crystalline quality, and a relaxed layer, formed by columnar grains, maintaining the epitaxial relationship with the substrate. The films presented smooth surfaces (RMS roughness ~ 0.55 nm), with circular equi-sized grains/crystallites, as observed by atomic force microscopy. The Hall measurements in Van der Pauw geometry revealed relatively high resistivity value ~ 620 μΩ cm, ascribed to electron scattering on interfaces, on grain boundaries and on different defects/dislocations. - Highlights: • Hetero-epitaxial TiC{sub 0.84} thin films were grown on MgO(001) at 100 °C by magnetron sputtering. • 62 nm thick films were synthesized by magnetron sputtering, using Ti, Ar and CH{sub 4}. • The film comprises a partially strained interface epilayer and a relaxed top layer. • Both layers preserve the epitaxial relationship with the substrate. • Low RMS surface roughness ~ 0.55 nm and grains with mean lateral size of ~ 38.5 nm were observed.

The effect of MEVVA ion implantation on the tribological properties of PVD-TiN films

International Nuclear Information System (INIS)

Manory, R.; Mollica, S.

1998-01-01

The present work is the first study in which the effects of metal evaporation vacuum (MEVVA) implantation are studied on TiN of the PVD type which is commercially available in Australia. The MEVVA ion implanter differs from the 'conventional' type of ion implanter in the fact that it has a high throughput of metal ions which are not mass analysed and therefore has more potential for industrial non-electronic applications. TiN-coated steel samples have been implanted with two types of species - one light and one heavy - C + and W + respectively. The samples were analysed by Rutherford backscattering (RBS) and x-ray diffraction (XRD). The tribological performance was assessed by pin-on-disc and microhardness. The results show that carbon implantation was very effective in improving the friction coefficient by the formation of a carbonaceous layer on the surface. XRD also shows formation of TiC in the near surface region. W implantation does not improve the friction coefficient but improves the lifetime of the coating. Unimplanted films fail in the pin-on-disk test after 7000 cycles, whereas implanted films are still well adhered after 18000 cycles

Evaluation of Osseous Integration of PVD-Silver-Coated Hip Prostheses in a Canine Model

Directory of Open Access Journals (Sweden)

Gregor Hauschild

2015-01-01

Full Text Available Infection associated with biomaterials used for orthopedic prostheses remains a serious complication in orthopedics, especially tumor surgery. Silver-coating of orthopedic (megaprostheses proved its efficiency in reducing infections but has been limited to surface areas exposed to soft tissues due to concerns of silver inhibiting osseous integration of cementless stems. To close this gap in the bactericidal capacity of silver-coated orthopedic prostheses extension of the silver-coating on surface areas intended for osseous integration seems to be inevitable. Our study reports about a PVD- (physical-vapor-deposition- silver-coated cementless stem in a canine model for the first time and showed osseous integration of a silver-coated titanium surface in vivo. Radiological, histological, and biomechanical analysis revealed a stable osseous integration of four of nine stems implanted. Silver trace elemental concentrations in serum did not exceed 1.82 parts per billion (ppb and can be considered as nontoxic. Changes in liver and kidney functions associated with the silver-coating could be excluded by blood chemistry analysis. This was in accordance with very limited metal displacement from coated surfaces observed by laser ablation inductively coupled plasma-mass spectrometry (LA-ICP-MS 12 months after implantation. In conclusion our results represent a step towards complete bactericidal silver-coating of orthopedic prostheses.

Evaluation of osseous integration of PVD-silver-coated hip prostheses in a canine model.

Science.gov (United States)

Hauschild, Gregor; Hardes, Jendrik; Gosheger, Georg; Stoeppeler, Sandra; Ahrens, Helmut; Blaske, Franziska; Wehe, Christoph; Karst, Uwe; Höll, Steffen

2015-01-01

Infection associated with biomaterials used for orthopedic prostheses remains a serious complication in orthopedics, especially tumor surgery. Silver-coating of orthopedic (mega)prostheses proved its efficiency in reducing infections but has been limited to surface areas exposed to soft tissues due to concerns of silver inhibiting osseous integration of cementless stems. To close this gap in the bactericidal capacity of silver-coated orthopedic prostheses extension of the silver-coating on surface areas intended for osseous integration seems to be inevitable. Our study reports about a PVD- (physical-vapor-deposition-) silver-coated cementless stem in a canine model for the first time and showed osseous integration of a silver-coated titanium surface in vivo. Radiological, histological, and biomechanical analysis revealed a stable osseous integration of four of nine stems implanted. Silver trace elemental concentrations in serum did not exceed 1.82 parts per billion (ppb) and can be considered as nontoxic. Changes in liver and kidney functions associated with the silver-coating could be excluded by blood chemistry analysis. This was in accordance with very limited metal displacement from coated surfaces observed by laser ablation inductively coupled plasma-mass spectrometry (LA-ICP-MS) 12 months after implantation. In conclusion our results represent a step towards complete bactericidal silver-coating of orthopedic prostheses.

Tube Inner Coating of Non-Conductive Films by Pulsed Reactive Coaxial Magnetron Plasma with Outer Anode

Directory of Open Access Journals (Sweden)

Musab Timan Idriss Gasab

2018-03-01

Full Text Available The double-ended coaxial magnetron pulsed plasma (DCMPP method with auxiliary outer anode was introduced in order to achieve the uniform coating of non-conductive thin films on the inner walls of insulator tubes. In this study, titanium (Ti was employed as a cathode (sputtering target, and a glass tube was used as a substrate. In an argon (Ar and oxygen (O2 gas mixture, magnetron plasma was generated. Oxygen gas was introduced to deposit a titanium oxide (TiO2 film. A comparison between films coated with and without an auxiliary outer anode was made. As a result, it was clearly shown that the DCMPP method using an auxiliary outer anode enhanced the uniformity of the deposited non-conductive film compared to the conventional DCMPP method. Moreover, the optimum conditions under which the thin TiO2 film was deposited on the inner wall of the glass tube were revealed. From the results, it was supposed that the auxiliary outer anode contributed to the uniformity of the distributions of deposited negative charge on the non-conductive film and consequently the electric field and the plasma density uniform.

Properties of nickel films growth by radio frequency magnetron sputtering at elevated substrate temperatures

Energy Technology Data Exchange (ETDEWEB)

Muslim, Noormariah, E-mail: 14h8702@ubd.edu.bn [Centre for Advanced Material and Energy Sciences, Universiti Brunei Darussalam, Jalan Tungku Link, Gadong BE1410 (Brunei Darussalam); Soon, Ying Woan [Centre for Advanced Material and Energy Sciences, Universiti Brunei Darussalam, Jalan Tungku Link, Gadong BE1410 (Brunei Darussalam); Physical and Geological Sciences, Faculty of Science, Universiti Brunei Darussalam, Jalan Tungku Link, Gadong BE1410 (Brunei Darussalam); Lim, Chee Ming; Voo, Nyuk Yoong [Centre for Advanced Material and Energy Sciences, Universiti Brunei Darussalam, Jalan Tungku Link, Gadong BE1410 (Brunei Darussalam)

2016-08-01

Pure nickel (Ni) thin films of thicknesses of 100 nm were deposited on glass substrates by radio frequency magnetron sputtering at a power of 100 W and at various substrate temperatures i.e., room temperature, 100, 200, and 300 °C. The crystalline structure, surface topography, surface morphology, electrical resistivity, and optical properties of the deposited films were studied. The properties of the Ni films could be controlled by altering the substrate temperature. Specifically, the films featured a face-centered cubic crystalline structure with predominant (111) crystallite orientation at all the substrate temperatures employed, as observed from the X-ray diffraction analysis. Films deposited at substrate temperatures greater than 200 °C additionally displayed crystalline (200) and (220) diffraction peaks. The surface morphology analysis revealed that the grain size of the Ni thin films increased with increasing substrate temperatures employed. This increase was accompanied with a decrease in the resistivity of the Ni films. The surface roughness of the films increased with increasing substrate temperatures employed, as observed from the atomic force microscopy analysis. - Highlights: • RF magnetron sputtering is a good alternative method to deposit Ni films. • Properties of Ni films could be controlled simply by tuning substrate temperatures. • Crystallite size and surface roughness increased with substrate temperatures. • Electrical resistivity reduced with increasing substrate temperatures. • Optical properties also changed with substrate temperatures.

Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

Directory of Open Access Journals (Sweden)

Ziad Y. Banyamin

2014-10-01

Full Text Available Fluorine doped tin oxide (FTO coatings have been prepared using the mid-frequency pulsed DC closed field unbalanced magnetron sputtering technique in an Ar/O2 atmosphere using blends of tin oxide and tin fluoride powder formed into targets. FTO coatings were deposited with a thickness of 400 nm on glass substrates. No post-deposition annealing treatments were carried out. The effects of the chemical composition on the structural (phase, grain size, optical (transmission, optical band-gap and electrical (resistivity, charge carrier, mobility properties of the thin films were investigated. Depositing FTO by magnetron sputtering is an environmentally friendly technique and the use of loosely packed blended powder targets gives an efficient means of screening candidate compositions, which also provides a low cost operation. The best film characteristics were achieved using a mass ratio of 12% SnF2 to 88% SnO2 in the target. The thin film produced was polycrystalline with a tetragonal crystal structure. The optimized conditions resulted in a thin film with average visible transmittance of 83% and optical band-gap of 3.80 eV, resistivity of 6.71 × 10−3 Ω·cm, a carrier concentration (Nd of 1.46 × 1020 cm−3 and a mobility of 15 cm2/Vs.

Type II textured molybdenum disulphide films produced by direct vapour transport and rf-magnetron sputtering

International Nuclear Information System (INIS)

Bohlken, S.F.; Lemon, K.D.; Jakovidis, G.; Taheri, E.H.

1999-01-01

Full text: Molybdenum disulphide (MoS 2 ) is one of the few naturally occurring Layered Transition Metal Dichalcogenides and is the primary source for elemental molybdenum. It displays exceptional lubrication performance in both vacuum and atmospheric conditions over a wide temperature range. An important emerging application of MoS 2 and related materials is photovoltaics. Films of MoS 2 exhibit several morphologies described by the orientation of platelets with respect to the substrate. Films with platelets perpendicular or parallel to the substrate are referred to by their morphology, which is type-I or type-II respectively. Production of exclusive type-II films is highly desirable in applications involving lubrication and photovoltaics. For example, type-II morphology reduces friction and minority carrier recombination centres, thus improving tribological and photovoltaic performance. We have successfully produced type-II films using both direct vapour transport and rf-magnetron sputtering Continuous polycrystalline films (∼ 10 μm thick) grown in our laboratory using vapour transport have typical areas 1000 mm 2 . A novel ejecta filtration technique was applied to rf-magnetron sputtering. Films produced using this approach retain exclusive type-II morphology at thicknesses where type-I would normally be observed (∼ 200nm)

Magnetron deposition of metal-ceramic protective coatings on glasses of windows of space vehicles

OpenAIRE

Sergeev, Viktor Petrovich; Panin, Viktor Evgenyevich; Psakhie, Sergey Grigorievich; Chernyavskii, Alexandr; Svechkin, Valerii; Khristenko, Yurii; Kalashnikov, Mark Petrovich; Voronov, Andrei

2014-01-01

Transparent refractory metal-ceramic nanocomposite coatings with a high coefficient of elasticrecovery and microhardness on the basis of Ni/Si-Al-N are formed on a glass substrate by the pulse magnetron deposition method. The structure-phase states were investigated by TEM, SEM. It was established that the first layer consists of Ni nanograins with a fcc crystalline lattice, the second layer is two-phase: 5-10 nm nanocrystallites of the AlN phase with the hcp crystalline lattice in amorphous ...

Improving the Tribological Properties of Spark-Anodized Titanium by Magnetron Sputtered Diamond-Like Carbon

OpenAIRE

Zhaoxiang Chen; Xipeng Ren; Limei Ren; Tengchao Wang; Xiaowen Qi; Yulin Yang

2018-01-01

Spark-anodization of titanium can produce adherent and wear-resistant TiO2 film on the surface, but the spark-anodized titanium has lots of surface micro-pores, resulting in an unstable and high friction coefficient against many counterparts. In this study, the diamond-like carbon (DLC) was introduced into the micro-pores of spark-anodized titanium by the magnetron sputtering technique and a TiO2/DLC composite coating was fabricated. The microstructure and tribological properties of TiO2/DLC ...

Reactive magnetron sputtering deposition of bismuth tungstate onto titania nanoparticles for enhancing visible light photocatalytic activity

Energy Technology Data Exchange (ETDEWEB)

Ratova, Marina, E-mail: marina_ratova@hotmail.com [Surface Engineering Group, School of Engineering, Manchester Metropolitan University, Manchester, M1 5GD (United Kingdom); Kelly, Peter J.; West, Glen T. [Surface Engineering Group, School of Engineering, Manchester Metropolitan University, Manchester, M1 5GD (United Kingdom); Tosheva, Lubomira; Edge, Michele [School of Science and the Environment, Manchester Metropolitan University, Manchester M1 5GD (United Kingdom)

2017-01-15

Highlights: • Bismuth tungstate coatings were deposited by reactive magnetron sputtering. • Oscillating bowl was introduced to the system to enable coating of nanopartulates. • Deposition of Bi{sub 2}WO{sub 6} enhanced visible light activity of titania nanoparticles. • The best results were obtained for coating with Bi:W ratio of approximately 2:1. • Deposition of Bi{sub 2}WO{sub 6} onto TiO{sub 2} resulted in more efficient electron-hole separation. - Abstract: Titanium dioxide − bismuth tungstate composite materials were prepared by pulsed DC reactive magnetron sputtering of bismuth and tungsten metallic targets in argon/oxygen atmosphere onto anatase and rutile titania nanoparticles. The use of an oscillating bowl placed beneath the two magnetrons arranged in a co-planar closed field configuration enabled the deposition of bismuth tungstate onto loose powders, rather than a solid substrate. The atomic ratio of the bismuth/tungsten coatings was controlled by varying the power applied to each target. The effect of the bismuth tungstate coatings on the phase, optical and photocatalytic properties of titania was investigated by X-ray diffraction, energy-dispersive X-ray spectroscopy (EDX), Brunauer–Emmett–Teller (BET) surface area measurements, transmission electron microscopy (TEM), UV–vis diffuse reflectance spectroscopy and an acetone degradation test. The latter involved measurements of the rate of CO{sub 2} evolution under visible light irradiation of the photocatalysts, which indicated that the deposition of bismuth tungstate resulted in a significant enhancement of visible light activity, for both anatase and rutile titania particles. The best results were achieved for coatings with a bismuth to tungsten atomic ratio of 2:1. In addition, the mechanism by which the photocatalytic activity of the TiO{sub 2} nanoparticles was enhanced by compounding it with bismuth tungstate was studied by microwave cavity perturbation. The results of these

Formation and investigation of multilayer nanostructured coatings TiN/MoN for different layers thicknesses with c-pvd

International Nuclear Information System (INIS)

Pogrebnyak, A.D.; Bondar, O.V.; Postol'nyj, B.A.; Andreev, A.A.; Abadias, G.; Beresnev, V.M.; Sobol', O.B.

2013-01-01

Multilayer coatings based on TiN/MoN were obtained using the vacuum arc evaporation cathode method (C-PVD). Multilayers thickness was in the range 6,7 ÷ 8,7 μm and monolayers thickness was 2, 10, 20 and 40 nm. Vacuum-arc unit Bulat 6 was used for depositions. For the analysis of multilayer structures and properties of nanostructured coatings XRD analysis method was used (D8 ADVANCE, Bruker). For elemental composition and morphology investigation of the surface layers and multilayered coatings SEM (JEOL-7001F) with EDX attachment was used. Also HRTEM method was used to analyze the phase composition. In addition, this article provides investigation of hardness by Micro-Hardness Tester CSM (Switzerland). AFM was used for additional analysis of the topography and surface roughness of these coatings. This investigation have revealed the relationship between the layers thicknesses, substrate potential, the annealing process, physical and mechanical properties of samples. (authors)

Karakteristik Morfologi Permukaan Pada Polimer PVdF-LiBOB-ZrO2 dan Potensinya untuk Elektrolit Baterai Litium

Directory of Open Access Journals (Sweden)

Etty Marti Wigayati

2018-02-01

Full Text Available Membran elektrolit polimer pada baterai litium ion berfungsi sebagai media transport ion dan sebagai separator antara anoda dan katoda. Dalam penelitian ini, telah dilakukan sintesis membran elektrolit polimer LiBOB (Lithium Bis Oksalato Borate dengan rumus kimia LiB(C2O42 dengan menggunakan Polyvilinidine fluoride (PVdF sebagai matriks dan bahan aditif  Zirkonium Oksida (ZrO2. Metoda yang dipergunakan adalah solution cast. Konsentrasi bahan aditif dibuat bervariasi. Membran yang terbentuk dikarakterisasi morfologi permukaan menggunakan Scanning Electrone Microscope (SEM, sifat elektrokimia dengan Cyclic Voltametric (CV dan kapasitas baterai dengan kurva charge discharge. Hasil penelitian menunjukkan bahwa morfologi permukaan rantai polimer saling berikatan dan tersusun dengan bagus. Pori tertutup oleh rantai polimer secara rata yang berikatan membentuk jaring dan saling bertumpukan pada keadaan amorf. Terjadi reaksi oksidasi dan reduksi pada sel baterai dengan kapasitas charge sekitar 24 mAh pada tegangan 4 volt, sedangkan kapasitas discharge bernilai sama sekitar 24 mAh pada tegangan 4 volt dengan penambahan 10% ZrO2.

Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates

Energy Technology Data Exchange (ETDEWEB)

Brennan, Christopher J.; Neumann, Christopher M.; Vitale, Steven A., E-mail: steven.vitale@ll.mit.edu [Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02420 (United States)

2015-07-28

Fully depleted silicon-on-insulator transistors were fabricated using two different metal gate deposition mechanisms to compare plasma damage effects on gate oxide quality. Devices fabricated with both plasma-enhanced atomic-layer-deposited (PE-ALD) TiN gates and magnetron plasma sputtered TiN gates showed very good electrostatics and short-channel characteristics. However, the gate oxide quality was markedly better for PE-ALD TiN. A significant reduction in interface state density was inferred from capacitance-voltage measurements as well as a 1200× reduction in gate leakage current. A high-power magnetron plasma source produces a much higher energetic ion and vacuum ultra-violet (VUV) photon flux to the wafer compared to a low-power inductively coupled PE-ALD source. The ion and VUV photons produce defect states in the bulk of the gate oxide as well as at the oxide-silicon interface, causing higher leakage and potential reliability degradation.

Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursor

Energy Technology Data Exchange (ETDEWEB)

Hänninen, Tuomas, E-mail: tuoha@ifm.liu.se; Schmidt, Susann; Jensen, Jens; Hultman, Lars; Högberg, Hans [Thin Film Physics Division, Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping SE-581 83 (Sweden)

2015-09-15

Silicon oxynitride thin films were synthesized by reactive high power impulse magnetron sputtering of silicon in argon/nitrous oxide plasmas. Nitrous oxide was employed as a single-source precursor supplying oxygen and nitrogen for the film growth. The films were characterized by elastic recoil detection analysis, x-ray photoelectron spectroscopy, x-ray diffraction, x-ray reflectivity, scanning electron microscopy, and spectroscopic ellipsometry. Results show that the films are silicon rich, amorphous, and exhibit a random chemical bonding structure. The optical properties with the refractive index and the extinction coefficient correlate with the film elemental composition, showing decreasing values with increasing film oxygen and nitrogen content. The total percentage of oxygen and nitrogen in the films is controlled by adjusting the gas flow ratio in the deposition processes. Furthermore, it is shown that the film oxygen-to-nitrogen ratio can be tailored by the high power impulse magnetron sputtering-specific parameters pulse frequency and energy per pulse.

Magnetron injection gun for a broadband gyrotron backward-wave oscillator

International Nuclear Information System (INIS)

Yuan, C. P.; Chang, T. H.; Chen, N. C.; Yeh, Y. S.

2009-01-01

The magnetron injection gun is capable of generating relativistic electron beam with high velocity ratio and low velocity spread for a gyrotron backward-wave oscillator (gyro-BWO). However, the velocity ratio (α) varies drastically against both the magnetic field and the beam voltage, which significantly limits the tuning bandwidth of a gyro-BWO. This study remedies this drawback by adding a variable trim field to adjust the magnetic compression ratio when changing the operating conditions. Theoretical results obtained by employing a two-dimensional electron gun code (EGUN) demonstrate a constant velocity ratio of 1.5 with a low axial velocity spread of 6% from 3.4-4.8 Tesla. These results are compared with a three-dimensional particle-tracing code (computer simulation technology, CST). The underlying physics for constant α will be discussed in depth.

Magnetron injection gun for a broadband gyrotron backward-wave oscillator

Science.gov (United States)

Yuan, C. P.; Chang, T. H.; Chen, N. C.; Yeh, Y. S.

2009-07-01

The magnetron injection gun is capable of generating relativistic electron beam with high velocity ratio and low velocity spread for a gyrotron backward-wave oscillator (gyro-BWO). However, the velocity ratio (α) varies drastically against both the magnetic field and the beam voltage, which significantly limits the tuning bandwidth of a gyro-BWO. This study remedies this drawback by adding a variable trim field to adjust the magnetic compression ratio when changing the operating conditions. Theoretical results obtained by employing a two-dimensional electron gun code (EGUN) demonstrate a constant velocity ratio of 1.5 with a low axial velocity spread of 6% from 3.4-4.8 Tesla. These results are compared with a three-dimensional particle-tracing code (computer simulation technology, CST). The underlying physics for constant α will be discussed in depth.

Synthesis of ReN3 Thin Films by Magnetron Sputtering

Directory of Open Access Journals (Sweden)

G. Soto

2014-01-01

Full Text Available In this work ReNx films were prepared by reactive magnetron sputtering at room temperature and deposited on a silicon wafer. It was found that the diffractograms of the nitrogen-rich rhenium film are consistent with those produced by high-pressure high-temperature methods, under the assumption that the film is oriented on the substrate. Using density functional calculations it was found that the composition of this compound could be ReN3, instead of ReN2, as stated on previous works. The ReN3 compound fits in the Ama2 (40 orthorhombic space group, and due to the existence of N3 anions between Re layers it should be categorized as an azide. The material is exceptionally brittle and inherently unstable under indentation testing.

Direct current magnetron sputter-deposited ZnO thin films

International Nuclear Information System (INIS)

Hoon, Jian-Wei; Chan, Kah-Yoong; Krishnasamy, Jegenathan; Tou, Teck-Yong; Knipp, Dietmar

2011-01-01

Zinc oxide (ZnO) is a very promising electronic material for emerging transparent large-area electronic applications including thin-film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 150 nm to 750 nm were deposited on glass substrates. The deposition pressure and the substrate temperature were varied from 12 mTorr to 25 mTorr, and from room temperature to 450 deg. C, respectively. The influence of the film thickness, deposition pressure and the substrate temperature on structural and optical properties of the ZnO films was investigated using atomic force microscopy (AFM) and ultraviolet-visible (UV-Vis) spectrometer. The experimental results reveal that the film thickness, deposition pressure and the substrate temperature play significant role in the structural formation and the optical properties of the deposited ZnO thin films.

RF Magnetron Sputtering Deposited W/Ti Thin Film For Smart Window Applications

Science.gov (United States)

Oksuz, Lutfi; Kiristi, Melek; Bozduman, Ferhat; Uygun Oksuz, Aysegul

2014-10-01

Electrochromic (EC) devices can change reversible and persistent their optical properties in the visible region (400-800 nm) upon charge insertion/extraction according to the applied voltage. A complementary type EC is a device containing two electrochromic layers, one of which is anodically colored such as vanadium oxide (V2 O5) while the other cathodically colored such as tungsten oxide (WO3) which is separated by an ionic conduction layer (electrolyte). The use of a solid electrolyte such as Nafion eliminates the need for containment of the liquid electrolyte, which simplifies the cell design, as well as improves safety and durability. In this work, the EC device was fabricated on a ITO/glass slide. The WO3-TiO2 thin film was deposited by reactive RF magnetron sputtering using a 2-in W/Ti (9:1%wt) target with purity of 99.9% in a mixture gas of argon and oxygen. As a counter electrode layer, V2O5 film was deposited on an ITO/glass substrate using V2O3 target with the same conditions of reactive RF magnetron sputtering. Modified Nafion was used as an electrolyte to complete EC device. The transmittance spectra of the complementary EC device was measured by optical spectrophotometry when a voltage of +/-3 V was applied to the EC device by computer controlled system. The surface morphology of the films was characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM) (Fig. 2). The cyclic voltammetry (CV) for EC device was performed by sweeping the potential between +/-3 V at a scan rate of 50 mV/s.

Fractal features of CdTe thin films grown by RF magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Hosseinpanahi, Fayegh, E-mail: f.hosseinpanahi@yahoo.com [Department of Physics, Payame Noor University, P.O. Box 19395-4697, Tehran (Iran, Islamic Republic of); Raoufi, Davood [Department of Physics, University of Bu Ali Sina, P.O. Box 65174, Hamedan (Iran, Islamic Republic of); Ranjbarghanei, Khadijeh [Department of Physics, Plasma Physics Research Center, Science & Research Branch Islamic Azad University, Tehran (Iran, Islamic Republic of); Karimi, Bayan [Department of Physics, Payame Noor University, P.O. Box 19395-4697, Tehran (Iran, Islamic Republic of); Babaei, Reza [Department of Physics, Plasma Physics Research Center, Science & Research Branch Islamic Azad University, Tehran (Iran, Islamic Republic of); Hasani, Ebrahim [Department of Physics, University of Bu Ali Sina, P.O. Box 65174, Hamedan (Iran, Islamic Republic of)

2015-12-01

Graphical abstract: - Highlights: • CdTe thin films were deposited on glass substrates by RF magnetron sputtering at room temperature with different deposition time 5, 10 and 15 min. • Nanostructure of CdTe layer indicates that CdTe films are polycrystalline and have zinc blende structure, irrespective of their deposition time. • Complexity and roughness of the CdTe films and strength of multifractality increase with increasing deposition time. • Detrended fluctuation analysis (DFA) and also multifractal detrended fluctuation analysis (MFDFA) methods showed that prepared CdTe films have multifractal nature. - Abstract: Cadmium telluride (CdTe) thin films were prepared by RF magnetron sputtering on glass substrates at room temperature (RT). The film deposition was performed for 5, 10, and 15 min at power of 30 W with a frequency of 13.56 MHz. The crystal structure of the prepared CdTe thin films was studied by X-ray diffraction (XRD) technique. XRD analyses indicate that the CdTe films are polycrystalline, having zinc blende structure of CdTe irrespective of their deposition time. All CdTe films showed a preferred orientation along (1 1 1) crystalline plane. The surface morphology characterization of the films was studied using atomic force microscopy (AFM). The quantitative AFM characterization shows that the RMS surface roughness of the prepared CdTe thin films increases with increasing the deposition time. The detrended fluctuation analysis (DFA) and also multifractal detrended fluctuation analysis (MFDFA) methods showed that prepared CdTe thin films have multifractal nature. The complexity, roughness of the CdTe thin films and strength of the multifractality increase as deposition time increases.

Fractal features of CdTe thin films grown by RF magnetron sputtering

International Nuclear Information System (INIS)

Hosseinpanahi, Fayegh; Raoufi, Davood; Ranjbarghanei, Khadijeh; Karimi, Bayan; Babaei, Reza; Hasani, Ebrahim

2015-01-01

Graphical abstract: - Highlights: • CdTe thin films were deposited on glass substrates by RF magnetron sputtering at room temperature with different deposition time 5, 10 and 15 min. • Nanostructure of CdTe layer indicates that CdTe films are polycrystalline and have zinc blende structure, irrespective of their deposition time. • Complexity and roughness of the CdTe films and strength of multifractality increase with increasing deposition time. • Detrended fluctuation analysis (DFA) and also multifractal detrended fluctuation analysis (MFDFA) methods showed that prepared CdTe films have multifractal nature. - Abstract: Cadmium telluride (CdTe) thin films were prepared by RF magnetron sputtering on glass substrates at room temperature (RT). The film deposition was performed for 5, 10, and 15 min at power of 30 W with a frequency of 13.56 MHz. The crystal structure of the prepared CdTe thin films was studied by X-ray diffraction (XRD) technique. XRD analyses indicate that the CdTe films are polycrystalline, having zinc blende structure of CdTe irrespective of their deposition time. All CdTe films showed a preferred orientation along (1 1 1) crystalline plane. The surface morphology characterization of the films was studied using atomic force microscopy (AFM). The quantitative AFM characterization shows that the RMS surface roughness of the prepared CdTe thin films increases with increasing the deposition time. The detrended fluctuation analysis (DFA) and also multifractal detrended fluctuation analysis (MFDFA) methods showed that prepared CdTe thin films have multifractal nature. The complexity, roughness of the CdTe thin films and strength of the multifractality increase as deposition time increases.

Evaluation of composition, mechanical properties and structure of nc-TiC/a-C:H coatings prepared by balanced magnetron sputtering

Czech Academy of Sciences Publication Activity Database

Souček, P.; Schmidtová, T.; Zábranský, L.; Buršíková, V.; Vašina, P.; Caha, O.; Jílek, M.; Abdelazziz, El Mel.; Tessier, P.Y.; Schäfer, J.; Buršík, Jiří; Peřina, Vratislav; Mikšová, Romana

2012-01-01

Roč. 211, OCT 25 (2012), s. 111-116 ISSN 0257-8972 Institutional support: RVO:68081723 ; RVO:61389005 Keywords : nanocomposite * magnetron sputtering * titanium Subject RIV: JI - Composite Materials; BL - Plasma and Gas Discharge Physics (UJF-V) Impact factor: 1.941, year: 2012

125 MeV Si 9+ ion irradiation of calcium phosphate thin film coated by rf-magnetron sputtering technique

Science.gov (United States)

Elayaraja, K.; Joshy, M. I. Ahymah; Suganthi, R. V.; Kalkura, S. Narayana; Palanichamy, M.; Ashok, M.; Sivakumar, V. V.; Kulriya, P. K.; Sulania, I.; Kanjilal, D.; Asokan, K.

2011-01-01

Titanium substrate was coated with hydroxyapatite by radiofrequency magnetron sputtering (rf-magnetron sputtering) technique and subjected to swift heavy ion (SHI) irradiation of 125 MeV with Si 9+ at fluences of 1 × 10 10, 1 × 10 11 and 1 × 10 12 ions/cm 2. The glancing incidence X-ray diffraction (GIXRD) analysis confirmed the HAp phase of the irradiated film. There was a considerable decrease in crystallinity and particle size after irradiation. In addition, DRS-UV reflectance spectra revealed a decrease in optical band gap ( Eg) from 5.2 to 4.6 eV. Wettability of biocompatible materials plays an important role in biological cells proliferation for tissue engineering, drug delivery, gene transfer and bone growth. HAp thin films irradiated with 1 × 10 11 ions/cm 2 fluence showed significant increase in wettability. While the SHI irradiated samples exhibited enhanced bioactivity, there was no significant variation in cell viability. Surface roughness, pores and average particle size were analyzed by atomic force microscopy (AFM).

Self-dual Hopf quivers

International Nuclear Information System (INIS)

Huang Hualin; Li Libin; Ye Yu

2004-07-01

We study pointed graded self-dual Hopf algebras with a help of the dual Gabriel theorem for pointed Hopf algebras. Quivers of such Hopf algebras are said to be self-dual. An explicit classification of self-dual Hopf quivers is obtained. We also prove that finite dimensional coradically graded pointed self-dual Hopf algebras are generated by group-like and skew-primitive elements as associative algebras. This partially justifies a conjecture of Andruskiewitsch and Schneider and may help to classify finite dimensional self-dual pointed Hopf algebras

Recent Developments in R.F. Magnetron Sputtered Thin Films for pH Sensing Applications—An Overview

OpenAIRE

D. K. Maurya; A. Sardarinejad; K. Alameh

2014-01-01

pH sensors are widely used in chemical and biological applications. Metal oxides-based pH sensors have many attractive features including insolubility, stability, mechanical strength, electrocatalyst and manufacturing technology. Various metal oxide thin films prepared by radio frequency (R.F.) magnetron sputtering have attractive features, including high pH sensitivity, fast response, high resolution, good stability and reversibility as well as potential for measuring pH under conditions th...

Turbostratic-like carbon nitride coatings deposited by industrial-scale direct current magnetron sputtering

International Nuclear Information System (INIS)

Louring, S.; Madsen, N.D.; Berthelsen, A.N.; Christensen, B.H.; Almtoft, K.P.; Nielsen, L.P.; Bøttiger, J.

2013-01-01

Carbon nitride thin films were deposited by direct current magnetron sputtering in an industrial-scale equipment at different deposition temperatures and substrate bias voltages. The films had N/(N + C) atomic fractions between 0.2 and 0.3 as determined by X-ray photoelectron spectroscopy (XPS). Raman spectroscopy provided insight into the ordering and extension of the graphite-like clusters, whereas nanoindentation revealed information on the mechanical properties of the films. The internal compressive film stress was evaluated from the substrate bending method. At low deposition temperatures the films were amorphous, whereas the film deposited at approximately 380 °C had a turbostratic-like structure as confirmed by high-resolution transmission electron microscopy images. The turbostratic-like film had a highly elastic response when subjected to nanoindentation. When a CrN interlayer was deposited between the film and the substrate, XPS and Raman spectroscopy indicated that the turbostratic-like structure was maintained. However, it was inconclusive whether the film still exhibited an extraordinary elastic recovery. An increased substrate bias voltage, without additional heating and without deposition of an interlayer, resulted in a structural ordering, although not to the extent of a turbostratic-like structure. - Highlights: • Carbon nitride films were deposited by industrial-scale magnetron sputtering. • The deposition temperature and the substrate bias voltage were varied. • A turbostratic-like structure was obtained at an elevated deposition temperature. • The turbostratic-like film exhibited a very high elastic recovery. • The influence of a CrN interlayer on the film properties was investigated

Comparison of effective relative dielectric permittivities obtained by three independent ways for CeO2-Sm2O3 films prepared by EB-PVD (+IBAD) techniques

International Nuclear Information System (INIS)

Kundracik, F.; Neilinger, P.; Hartmanova, M.; Nadazdy, V.; Mansilla, C.

2011-01-01

Ceria, as material with relatively high dielectric permittivity, ε r , and ability to form films on the Si substrate, is a candidate for the gate dielectrics in the MOS devices. Doping with suitable e.g. trivalent rare earth oxides and suitable treatment after deposition (preparation) can improve their properties, e.g. ionic conductivity, dielectric permittivity and mechanical hardness. In this work, the dielectric properties of CeO 2 + Sm 2 O 3 films prepared by electron beam physical vapour deposition (EB-PVD) and some of them simultaneously also by the Ar + ionic beam assisted deposition (IBAD) techniques are analysed. (authors)

Properties of tungsten films prepared by magnetron sputtering

International Nuclear Information System (INIS)

Ahn, K.Y.; Ting, C.Y.; Brodsky, S.B.; Fryer, P.M.; Davari, B.; Angillelo, J.; Herd, S.R.; Licata, T.

1986-01-01

High-rate magnetron sputtering is a relatively simple process to produce tungsten films with good electrical and mechanical properties, and it offers good uniformity, reproducibility, process flexibility, and high throughput. The purity of the sputtered films is affected by the target purity (cold-pressed 99.95%, chemical vapor deposited 99.99% and cast 99.999%), base pressure, deposition rate, and substrate bias. Typical resistivity in films of 2000 to 3000A thickness deposited on Si, poly-Si, and SiO/sub 2/ ranges from 10 to 12 μΩ-cm, and this may be compared with 6 and 11 μΩ-cm by high-temperature evaporation and chemical vapor deposition, respectively. The presence of biaxial stress caused by substrate scanning was determined by x-ray technique. The sputtered films exhibit high compressive stress when deposited at low Ar pressure. It decreases with increasing pressure, and eventually changes sign to become tensile, and increases further with increasing pressure. Effects of processing parameters on films properties, and a comparison of film properties prepared by evaporation and chemical vapor deposition are discussed

Hemocompatibility of Inorganic Physical Vapor Deposition (PVD Coatings on Thermoplastic Polyurethane Polymers

Directory of Open Access Journals (Sweden)

Daniel Heim

2012-04-01

Full Text Available Biocompatibility improvements for blood contacting materials are of increasing interest for implanted devices and interventional tools. The current study focuses on inorganic (titanium, titanium nitride, titanium oxide as well as diamond-like carbon (DLC coating materials on polymer surfaces (thermoplastic polyurethane, deposited by magnetron sputtering und pulsed laser deposition at room temperature. DLC was used pure (a-C:H as well as doped with silicon, titanium, and nitrogen + titanium (a-C:H:Si, a-C:H:Ti, a-C:H:N:Ti. In-vitro testing of the hemocompatibility requires mandatory dynamic test conditions to simulate in-vivo conditions, e.g., realized by a cone-and-plate analyzer. In such tests, titanium- and nitrogen-doped DLC and titanium nitride were found to be optimally anti-thrombotic and better than state-of-the-art polyurethane polymers. This is mainly due to the low tendency to platelet microparticle formation, a high content of remaining platelets in the whole blood after testing and low concentration of platelet activation and aggregation markers. Comparing this result to shear-flow induced cell motility tests with e.g., Dictostelium discoideum cell model organism reveals similar tendencies for the investigated materials.

Hemocompatibility of Inorganic Physical Vapor Deposition (PVD) Coatings on Thermoplastic Polyurethane Polymers.

Science.gov (United States)

Lackner, Juergen M; Waldhauser, Wolfgang; Hartmann, Paul; Bruckert, Franz; Weidenhaupt, Marianne; Major, Roman; Sanak, Marek; Wiesinger, Martin; Heim, Daniel

2012-04-17

Biocompatibility improvements for blood contacting materials are of increasing interest for implanted devices and interventional tools. The current study focuses on inorganic (titanium, titanium nitride, titanium oxide) as well as diamond-like carbon (DLC) coating materials on polymer surfaces (thermoplastic polyurethane), deposited by magnetron sputtering und pulsed laser deposition at room temperature. DLC was used pure (a-C:H) as well as doped with silicon, titanium, and nitrogen + titanium (a-C:H:Si, a-C:H:Ti, a-C:H:N:Ti). In-vitro testing of the hemocompatibility requires mandatory dynamic test conditions to simulate in-vivo conditions, e.g., realized by a cone-and-plate analyzer. In such tests, titanium- and nitrogen-doped DLC and titanium nitride were found to be optimally anti-thrombotic and better than state-of-the-art polyurethane polymers. This is mainly due to the low tendency to platelet microparticle formation, a high content of remaining platelets in the whole blood after testing and low concentration of platelet activation and aggregation markers. Comparing this result to shear-flow induced cell motility tests with e.g., Dictostelium discoideum cell model organism reveals similar tendencies for the investigated materials.

Dual Youla parameterization

DEFF Research Database (Denmark)

Niemann, Hans Henrik

2003-01-01

A different aspect of using the parameterisation of all systems stabilised by a given controller, i.e. the dual Youla parameterisation, is considered. The relation between system change and the dual Youla parameter is derived in explicit form. A number of standard uncertain model descriptions...... are considered and the relation with the dual Youla parameter given. Some applications of the dual Youla parameterisation are considered in connection with the design of controllers and model/performance validation....

Deposition of indium tin oxide films on acrylic substrates by radiofrequency magnetron sputtering

International Nuclear Information System (INIS)

Chiou, B.S.; Hsieh, S.T.; Wu, W.F.

1994-01-01

Indium tin oxide (ITO) films were deposited onto acrylic substrates by rf magnetron sputtering. Low substrate temperature (< 80 C) and low rf power (< 28 W) were maintained during sputtering to prevent acrylic substrate deformation. The influence of sputtering parameters, such as rf power, target-to-substrate distance, and chamber pressure, on the film deposition rate, the electrical properties, as well as the optical properties of the deposited films was investigated. Both the refractive index and the extinction coefficient were derived. The high reflection at wavelengths greater than 3 μm made these sputtered ITO films applicable to infrared mirrors

Applying RF Magnetron sputtering to prepare ZnO thin films and their characterization

International Nuclear Information System (INIS)

Saad, M.; Kassis, A.

2009-05-01

ZnO thin films were prepared using Rf magnetron sputtering under several preparation conditions (different values of deposition pressure, Rf power, substrate temperature). The optical properties of these films were investigated by measuring their transmission in the spectral range (300-1000 nm), and the electrical properties were investigated by measuring their electrical resistance. Results have been discussed in terms of the modified Thornton model for sputtered thin metal oxide films. Preparation conditions for depositing the highly resistive transparent i-ZnO buffer layer and the highly conducting transparent n-ZnO window layer for solar cells were proposed. (author)

Highly -oriented growth of polycrystalline silicon films on glass by pulsed magnetron sputtering

International Nuclear Information System (INIS)

Reinig, P.; Selle, B.; Fenske, F.; Fuhs, W.; Alex, V.; Birkholz, M.

2002-01-01

Nominally undoped polycrystalline silicon (poly-Si) thin films were deposited on glass at 450 deg. C at high deposition rate (>100 nm/min) by pulsed dc magnetron sputtering. The pulse frequency was found to have a significant influence on the preferred grain orientation. The x-ray diffraction pattern exhibits a strong enhancement of the (400) reflex with increasing pulse frequency. The quantitative evaluation reveals that over 90% of the grains are oriented. The observed change in preferred grain orientation in poly-Si films at low temperatures is associated with concurrent ion bombardment of the growing film

ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

Energy Technology Data Exchange (ETDEWEB)

Purandare, Yashodhan, E-mail: Y.Purandare@shu.ac.uk; Ehiasarian, Arutiun; Hovsepian, Papken [Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield S1 1WB (United Kingdom); Santana, Antonio [Ionbond AG Olten, Industriestrasse 211, CH-4600 Olten (Switzerland)

2014-05-15

Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.

Design of a magnetron injection gun for a 17.5-GHz

International Nuclear Information System (INIS)

Ha, H. J.; Kim, J. E.; Park, G. S.

1996-01-01

A gyrotwystron which is composed of cavities (gyro-klystron) and waveguides (gyro-TWT) is under investigation for broader bandwidth with high efficiency. A magnetron injection gun (MIG) for the gyrotwystron is designed with the trade-off equation for the MIG and optimized by computer simulation using the e-gun code. A 300-kW, 60-kV MIG with α ≡ υ t /υ z = 1.2 and Δυ z ≤ 5% designed for a 17.5-GHz gyrotwystron is discussed in this paper. Also, the effect of various MIG parameters, such as the beam voltage, the beam current, the magnetic field, the cathode radius and angle, and the MIG dimensions, on the characteristics of the beam (α, Δυ z ) is studied. (author)

Dual Smarandache Curves of a Timelike Curve lying on Unit dual Lorentzian Sphere

OpenAIRE

Kahraman, Tanju; Hüseyin Ugurlu, Hasan

2016-01-01

In this paper, we give Darboux approximation for dual Smarandache curves of time like curve on unit dual Lorentzian sphere. Firstly, we define the four types of dual Smarandache curves of a timelike curve lying on dual Lorentzian sphere.

Tribo-electrochemical characterization of hafnium multilayer systems deposited on nitride/vanadium nitride AISI 4140 steel

Science.gov (United States)

Mora, M.; Vera, E.; Aperador, W.

2016-02-01

In this work is presented the synergistic behaviour among corrosion/wear (tribocorrosion) of the multilayer coatings hafnium nitride/vanadium nitride [HfN/VN]n. The multilayers were deposited on AISI 4140 steel using the technique of physical vapor deposition PVD magnetron sputtering, the tests were performed using a pin-on-disk tribometer, which has an adapted potentiostat galvanostat with three-electrode electrochemical cell. Tribocorrosive parameters such as: Friction coefficient between the coating and the counter body (100 Cr6 steel ball); Polarization resistance by means of electrochemical impedance spectroscopy technique and corrosion rate by polarization curves were determined. It was observed an increase in the polarization resistance, a decrease in the corrosion rate and a low coefficient of friction in comparison with the substrate, due to an increase on the number of bilayers.

Tribo-electrochemical characterization of hafnium multilayer systems deposited on nitride/vanadium nitride AISI 4140 steel

International Nuclear Information System (INIS)

Mora, M; Vera, E; Aperador, W

2016-01-01

In this work is presented the synergistic behaviour among corrosion/wear (tribocorrosion) of the multilayer coatings hafnium nitride/vanadium nitride [HfN/VN]n. The multilayers were deposited on AISI 4140 steel using the technique of physical vapor deposition PVD magnetron sputtering, the tests were performed using a pin-on-disk tribometer, which has an adapted potentiostat galvanostat with three-electrode electrochemical cell. Tribocorrosive parameters such as: Friction coefficient between the coating and the counter body (100 Cr6 steel ball); Polarization resistance by means of electrochemical impedance spectroscopy technique and corrosion rate by polarization curves were determined. It was observed an increase in the polarization resistance, a decrease in the corrosion rate and a low coefficient of friction in comparison with the substrate, due to an increase on the number of bilayers. (paper)

Evolution of photo-stimulated luminescence of EB-PVD/(Ni, Pt)Al thermal barrier coatings

International Nuclear Information System (INIS)

Wen Mei; Jordan, Eric H.; Gell, Maurice

2005-01-01

Experiments are described which were designed to assess the suitability of photo-stimulated luminescence piezo-spectroscopy (PLPS) measurements as a basis for non-destructive inspection (NDI) and determination of life remaining of thermal barrier coatings (TBCs). Thermal cyclic tests were conducted on 7 wt.% Y 2 O 3 stabilized ZrO 2 (YSZ) electron beam physical vapor deposited (EB-PVD)/(Ni, Pt)Al/CMSX-4 TBCs at two temperatures 1151 and 1121 deg. C. The evolution of PLPS spectral characteristics (peak frequency shift, peak width and area ratio of peaks) was studied as a function of thermal cycles. It was observed that the average thermally grown oxide (TGO) stress and its standard deviation, and the area ratio of peaks show systematic change with thermal cycling, indicating that these characteristics can be used for NDI and determination of life remaining. The average TGO stress increases initially and then decreases monotonically with thermal cycling. The rate of change in the stress can be related to specimen life: the shallower the slope, the higher the life. The peak area ratio also decreases monotonically with cycling. The average TGO stress changes in a systematic manner versus remaining life fraction independent of temperature. Remaining life predictions were made based on average stress versus life fraction, which resulted in life assessments within ±13% of actual values excluding one specimen with abnormal behavior

Monte Carlo simulation of ionization in a magnetron plasma

International Nuclear Information System (INIS)

Miranda, J.E.; Goeckner, M.J.; Goree, J.; Sheridan, T.E.

1990-01-01

A Monte Carlo simulation of electrons emitted from the cathode of a planar magnetron is tested against experiments that were reported by Wendt, Lieberman, and Meuth [J. Vac. Sci. Technol. A 6, 1827 (1988)] and by Gu and Lieberman [J. Vac. Sci. Technol. A 6, 2960 (1988)]. Comparing their measurements of the radial profile of current and the axial profile of optical emission to the ionization profiles predicted by the model, we find good agreement for a typical magnetic field strength of 456 G. We also find that at 456 G the product of the average number of ionizations left-angle N i right-angle and the secondary electron emission coefficient γ is ∼1. This indicates that secondary emission contributes significantly to the ionization that sustains the discharge. At 171 G, however, left-angle N i right-angle γ much-lt 1, revealing that cathode emission is inadequate to sustain a discharge at a low magnetic field

Characterisation of magnetron sputtered SmCo5 thin films

International Nuclear Information System (INIS)

Wang, Y.; Sood, D.K.; Kothari

1999-01-01

SmCo 5 thin films were deposited using DC magnetron sputtering on single crystal silicon substrate with chromium and SiO 2 top layers. Deposition was carried out at three different substrate temperatures: room temperature, 400 deg C and 600 deg C. Films were characterised by using Rutherford Backscattering Spectroscopy (RBS), X-ray Diffraction (XRD), Secondary Ion Mass Spectrometry (SIMS) and SQUID magnetometer. RBS analysis indicated that the films have excellent stoichiometry with the Sm to Co ratio of 1:5. This analysis also showed that the films deposited or annealed at high temperatures (≥600 deg C) indicated significant inter-diffusion at the interface between the barrier layer and the film. Oxygen was found to be the major impurity in the films. XRD data indicated that the films formed 1:5 and 2:17 phases under different deposition conditions. The preliminary studies of these films using magnetic force microscopy revealed the presence of magnetic domains

Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide

Czech Academy of Sciences Publication Activity Database

Novotný, Michal; Bulíř, Jiří; Pokorný, Petr; Bočan, Jiří; Fitl, Přemysl; Lančok, Ján; Musil, Jindřich

2010-01-01

Roč. 12, č. 3 (2010), 697-700 ISSN 1454-4164 R&D Projects: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324 Institutional research plan: CEZ:AV0Z10100522 Keywords : reactive magnetron sputtering * alumina * plasma spectroscopy * mass spectroscopy * optical emission spectroscopy Subject RIV: BH - Optics, Masers, Lasers Impact factor: 0.412, year: 2010

Influence of substrate temperature on the optical and electrical properties magnetron sputtering ITO films

International Nuclear Information System (INIS)

Khripunov, G.S.; Yurchenko, G.V.

1999-01-01

Electrical and optical properties of ITO films obtained at substrate temperature from 200 degree C to 500 degree C by magnetron sputtering of target 95% In 2 O 3 - 5% SnO 2 were studied. It was shown that the ITO film obtained at the substrate temperature 300 i N have optimum combination of the optical and electrical characteristics: resistivity 2.1 centre dot 10 -4 Ω cm, transmittance in visible spectral range about 88% at the thickness film 0.61 μ, factor of quality reaches 8.2 centre dot 10 -2 Ω 1

Post-deposition annealing effects in RF reactive magnetron sputtered indium tin oxide thin films

Energy Technology Data Exchange (ETDEWEB)

Martinez, M A; Herrero, J; Gutierrez, M T [Inst. de Energias Renovables (CIEMAT), Madrid (Spain)

1992-05-01

Indium tin oxide films have been grown by RF reactive magnetron sputtering. The influence of the deposition parameters on the properties of the films has been investigated and optimized, obtaining a value for the figure of merit of 6700 ({Omega} cm){sup -1}. As-grown indium tin oxide films were annealed in vacuum and O{sub 2} atmosphere. After these heat treatments the electro-optical properties were improved, with values for the resistivity of 1.9x10{sup -4} {Omega} cm and the figure of merit of 26700 ({Omega} cm){sup -1}. (orig.).

Direct current magnetron sputtering deposition of InN thin films

International Nuclear Information System (INIS)

Cai Xingmin; Hao Yanqing; Zhang Dongping; Fan Ping

2009-01-01

In this paper, InN thin films were deposited on Si (1 0 0) and K9 glass by reactive direct current magnetron sputtering. The target was In metal with the purity of 99.999% and the gases were Ar (99.999%) and N 2 (99.999%). The properties of InN thin films were studied. Scanning electron microscopy (SEM) shows that the film surface is very rough and energy dispersive X-ray spectroscopy (EDX) shows that the film contains In, N and very little O. X-ray diffraction (XRD) and Raman scattering reveal that the film mainly contains hexagonal InN. The four-probe measurement shows that InN film is conductive. The transmission measurement demonstrates that the transmission of InN deposited on K9 glass is as low as 0.5% from 400 nm to 800 nm.

Spatially resolved electron density and electron energy distribution function in Ar magnetron plasmas used for sputter-deposition of ZnO-based thin films

Energy Technology Data Exchange (ETDEWEB)

Maaloul, L.; Gangwar, R. K.; Morel, S.; Stafford, L., E-mail: luc.stafford@umontreal.ca [Département de Physique, Université de Montréal, Montréal, Québec H3C 3J7 (Canada)

2015-11-15

Langmuir probe and trace rare gases optical emission spectroscopy were used to analyze the spatial structure of the electron density and electron energy distribution function (EEDF) in a cylindrical Ar magnetron plasma reactor used for sputter-deposition of ZnO-based thin films. While a typical Bessel (zero order) diffusion profile was observed along the radial direction for the number density of charged particles at 21 cm from the ZnO target, a significant rise of these populations with respect to the Bessel function was seen in the center of the reactor at 4 cm from the magnetron surface. As for the EEDF, it was found to transform from a more or less Maxwellian far from the target to a two-temperature Maxwellian with a depletion of high-energy electrons where magnetic field confinement effects become important. No significant change in the behavior of the electron density and EEDF across a wide range of pressures (5–100 mTorr) and self-bias voltages (115–300 V) was observed during magnetron sputtering of Zn, ZnO, and In{sub 2}O{sub 3} targets. This indicates that sputtering of Zn, In, and O atoms do not play a very significant role on the electron particle balance and electron heating dynamics, at least over the range of experimental conditions investigated.

Potassium-Based Dual Ion Battery with Dual-Graphite Electrode.

Science.gov (United States)

Fan, Ling; Liu, Qian; Chen, Suhua; Lin, Kairui; Xu, Zhi; Lu, Bingan

2017-08-01

A potassium ion battery has potential applications for large scale electric energy storage systems due to the abundance and low cost of potassium resources. Dual graphite batteries, with graphite as both anode and cathode, eliminate the use of transition metal compounds and greatly lower the overall cost. Herein, combining the merits of the potassium ion battery and dual graphite battery, a potassium-based dual ion battery with dual-graphite electrode is developed. It delivers a reversible capacity of 62 mA h g -1 and medium discharge voltage of ≈3.96 V. The intercalation/deintercalation mechanism of K + and PF 6 - into/from graphite is proposed and discussed in detail, with various characterizations to support. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Dual vector multiplet coupled to dual N=1 supergravity in 10D

International Nuclear Information System (INIS)

Nishino, Hitoshi; Rajpoot, Subhash

2005-01-01

We couple in superspace a dual vector multiplet (C m 1 ...m 7 ,λ α ) to the dual version of N=1 supergravity (e m a ,ψ m α ,M m 1 ...m 6 ,χ α ,Φ) in ten dimensions. The 7-form field C has its 8-form field strength H dual to the 2-form field strength F of the conventional vector multiplet. To simplify the computation, we use so-called beta-function-favored superspace constraints for dual supergravity developed for β-function computations. As in a more conventional constraint set, the H-Bianchi identity must have the form N and F, where N is the 7-form field strength in dual supergravity. The potential anomaly for the dual vector multiplet can be cancelled for the particular gauge group U(1) 496 by the Green-Schwarz mechanism. As a by-product, we also give the globally supersymmetric Abelian Dirac-Born-Infeld interactions for the dual vector multiplet for the first time

Assessing the role of secondary electron emission on the characteristics of 6-cavity magnetrons with transparent cathode through particle-in-cell simulations

Energy Technology Data Exchange (ETDEWEB)

Qiu, Hao; Joshi, Ravi P., E-mail: rjoshi@odu.edu [Department of Electrical and Computer Engineering, Old Dominion University, Norfolk, Virginia 23529-0246 (United States); Prasad, Sarita; Schamiloglu, Edl [Department of Electrical and Computer Engineering, University of New Mexico, Albuquerque, New Mexico 87131-0001 (United States); Ludeking, Lars [ATK Mission Systems, 8560 Cinderbed Road, Suite 700, Newington, Virginia 22122 (United States)

2014-05-21

Effects of secondary electron emission (SEE) on the performance of a 6-cavity relativistic magnetron with transparent cathodes are probed through particle-in-cell simulations. Appropriate relations for the secondary electron yield have been developed and used. For comparisons, separate simulations have been performed with- and without electron cascading. Simulation results seem to indicate SEE to be detrimental to the power output due to deviations in the starting trajectories of secondary electrons, and the reduced fraction with synchronized rotational velocity. A higher reduction in output power is predicted with electron cascading, though mode competition was not seen at the 0.65 T field. A possible solution to mitigating SEE in magnetrons for high power microwave applications would be to alter the surface properties of emitting electrodes through irradiation, which can lead to graphitic film formation.

Omnidirectional photonic band gap in magnetron sputtered TiO{sub 2}/SiO{sub 2} one dimensional photonic crystal

Energy Technology Data Exchange (ETDEWEB)

Jena, S., E-mail: shuvendujena9@gmail.com [Atomic & Molecular Physics Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085 (India); Tokas, R.B.; Sarkar, P. [Atomic & Molecular Physics Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085 (India); Misal, J.S.; Maidul Haque, S.; Rao, K.D. [Photonics & Nanotechnology Section, BARC-Vizag, Autonagar, Atomic & Molecular Physics Division, Bhabha Atomic Research Centre facility, Visakhapatnam 530 012 (India); Thakur, S.; Sahoo, N.K. [Atomic & Molecular Physics Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085 (India)

2016-01-29

One dimensional photonic crystal (1DPC) of TiO{sub 2}/SiO{sub 2} multilayer has been fabricated by sequential asymmetric bipolar pulsed dc magnetron sputtering of TiO{sub 2} and radio frequency magnetron sputtering of SiO{sub 2} to achieve wide omnidirectional photonic band in the visible region. The microstructure and optical response of the TiO{sub 2}/SiO{sub 2} photonic crystal have been characterized by atomic force microscopy, scanning electron microscopy and spectrophotometry respectively. The surface of the photonic crystal is very smooth having surface roughness of 2.6 nm. Reflection and transmission spectra have been measured in the wavelength range 300 to 1000 nm for both transverse electric and transverse magnetic waves. Wide high reflection photonic band gap (∆ λ = 245 nm) in the visible and near infrared regions (592–837 nm) at normal incidence has been achieved. The measured photonic band gap (PBG) is found well matching with the calculated photonic band gap of an infinite 1DPC. The experimentally observed omnidirectional photonic band 592–668 nm (∆ λ = 76 nm) in the visible region with band to mid-band ratio ∆ λ/λ = 12% for reflectivity R > 99% over the incident angle range of 0°–70° is found almost matching with the calculated omnidirectional PBG. The omnidirectional reflection band is found much wider as compared to the values reported in literature so far in the visible region for TiO{sub 2}/SiO{sub 2} periodic photonic crystal. - Highlights: • TiO{sub 2}/SiO{sub 2} 1DPC has been fabricated using magnetron sputtering technique. • Experimental optical response is found good agreement with simulation results. • Wide omnidirectional photonic band in the visible spectrum has been achieved.

Deposition of amino-rich thin films by RF magnetron sputtering of nylon

Energy Technology Data Exchange (ETDEWEB)

Kylian, O; Hanus, J; Choukourov, A; Kousal, J; SlavInska, D; Biederman, H, E-mail: ondrej.kylian@gmail.co [Charles University, Faculty of Mathematics and Physics, V Holesovickach 2, Prague 8, 180 00 (Czech Republic)

2009-07-21

RF magnetron sputtering of a nylon target in different gas mixtures was studied in order to evaluate the capability of this process to deposit amino-rich coatings needed in a wide range of biomedical applications. It has been demonstrated that both the deposition rate of the coatings and the surface density of primary amino groups are strongly linked with working gas mixture composition. From this point of view, a sufficiently high deposition rate as well as the highest amine efficiency reaching a NH{sub 2}/C value of 18% was observed in the N{sub 2}/H{sub 2} discharge, which leads to the surface exhibiting a high rate of protein adsorption. (fast track communication)

Experimental and numerical investigations on the temperature distribution in PVD AlTiN coated and uncoated Al2O3/TiCN mixed ceramic cutting tools in hard turning of AISI 52100 steel

Science.gov (United States)

Sateesh Kumar, Ch; Patel, Saroj Kumar; Das, Anshuman

2018-03-01

Temperature generation in cutting tools is one of the major causes of tool failure especially during hard machining where machining forces are quite high resulting in elevated temperatures. Thus, the present work investigates the temperature generation during hard machining of AISI 52100 steel (62 HRC hardness) with uncoated and PVD AlTiN coated Al2O3/TiCN mixed ceramic cutting tools. The experiments were performed on a heavy duty lathe machine with both coated and uncoated cutting tools under dry cutting environment. The temperature of the cutting zone was measured using an infrared thermometer and a finite element model has been adopted to predict the temperature distribution in cutting tools during machining for comparative assessment with the measured temperature. The experimental and numerical results revealed a significant reduction of cutting zone temperature during machining with PVD AlTiN coated cutting tools when compared to uncoated cutting tools during each experimental run. The main reason for decrease in temperature for AlTiN coated tools is the lower coefficient of friction offered by the coating material which allows the free flow of the chips on the rake surface when compared with uncoated cutting tools. Further, the superior wear behaviour of AlTiN coating resulted in reduction of cutting temperature.

Structure and tribological properties of MoS2 low friction thin films

Directory of Open Access Journals (Sweden)

Paradecka Agnieszka

2017-01-01

Full Text Available The main aim of the studies was the deposition of the AlCrN film, covered by molybdenum disulphide (MoS2 – based lubricant, on the austenitic steel substrate. The AlCrN and MoS2 layers were deposited by PVD lateral rotating ARC-cathodes (LARC and magnetron sputtering technology on the X6CrNiMoTi17-12-2 respectively. Structural characterizations of the MoS2 thin films have been carried out using SEM (scanning electron microscopy and AFM (atomic force microscopy to determine the surface topography as well as HRTEM (high-resolution transmission electron microscopy and Raman spectroscopy for structural investigations. The tribological wear relationships using ball-on-disc test were specified for surface layers, determining the friction co-efficient and mass loss of the investigated surfaces. Tests of the coatings’ adhesion to the substrate material were made using the scratch test. HRTEM investigation shows an amorphous character of the MoS2 layer. In sliding dry friction conditions, the friction co-efficient for the investigated elements is set in the range between 0.4-0.5. The investigated coating reveals high wear resistance. The coating demonstrated a dense cross-sectional morphology as well as good adhesion to the substrate. The good properties of the PVD AlCrN+MoS2 coatings make them suitable in various engineering and industrial applications.

Titanium dioxide (TIO2) thin film and plasma properties in RF magnetron sputtering

International Nuclear Information System (INIS)

Ali, Riyaz Ahmad Mohamed; Nayan, Nafarizal

2013-01-01

Lately, titanium dioxide (TiO 2 ) films with anatase crystalline property received numerous attentions as unique material properties. There are wide applications of TiO 2 thin film such as for photocatalytic application in solar cell. In the present study, radio frequency (RF) magnetron sputtering technique has been used to produce high dense, homogeneously controllable film layer at low deposition temperature using titanium (Ti) target. The diameter of the Ti target is 3 inch with fixed discharge power of 400W. Magnetron sputtering plasma has been produced in high purity 99.99% Argon (Ar) and 99.99% Oxygen (O 2 ) environment pressure ranging from 5 to 20 mTorr. The TiO2 were growth on silicon and glass substrates. Substrate temperature during deposition was kept constant at 400°C. The distance between target and substrate holder was maintain at 14 cm with rotation of 10 rotation-per-minutes. Our X-ray diffraction result, shows anatase crystalline successfully formed with characterization peaks of plane (101) at 2θ = 25.28°, plane (202) at 2θ = 48.05° and plane (211) at 2θ = 55.06°. In addition, it is our interest to study the plasma properties and optical spectrum of Ti, Ti+ , O- , ArM and Ar+ in the chamber during the deposition process. Result of emission line intensities, electron density and temperature from optical spectroscope and Langmuir probe will be discuss further during the workshop. This works were supported by Graduate Incentive Scheme of Universiti Tun Hussein Onn Malaysia (UTHM) and Fundamental Research Grant Scheme of Ministry of Higher Education, Malaysia. (author)

A Magnetron Sputter Deposition System for the Development of X-Ray Multilayer Optics

Science.gov (United States)

Broadway, David

2015-01-01

The project objective is to establish the capability to deposit multilayer structures for x-ray, neutron, and extreme ultraviolet (EUV) optic applications through the development of a magnetron sputtering deposition system. A specific goal of this endeavor is to combine multilayer deposition technology with the replication process in order to enhance NASA Marshall Space Flight Center's (MSFC's) position as a world leader in the design of innovative x-ray instrumentation through the development of full shell replicated multilayer optics. The development of multilayer structures are absolutely necessary in order to advance the field of x-ray astronomy by pushing the limit for observing the universe to ever-increasing photon energies (i.e., up to 200 keV or higher), well beyond Chandra's (approx.10 keV) and NuStar's (approx.75 keV) capability. The addition of multilayer technology would significantly enhance the x-ray optics capability at MSFC and allow NASA to maintain its world leadership position in the development, fabrication, and design of innovative x-ray instrumentation, which would be the first of its kind by combining multilayer technology with the mirror replication process. This marriage of these technologies would allow astronomers to see the universe in a new light by pushing to higher energies that are out of reach with today's instruments. To this aim, a magnetron vacuum sputter deposition system for the deposition of novel multilayer thin film x-ray optics is proposed. A significant secondary use of the vacuum deposition system includes the capability to fabricate multilayers for applications in the field of EUV optics for solar physics, neutron optics, and x-ray optics for a broad range of applications including medical imaging.

A Magnetron Sputter Deposition System for the Development of Multilayer X-Ray Optics

Science.gov (United States)

Broadway, David; Ramsey, Brian; Gubarev, Mikhail

2014-01-01

The proposal objective is to establish the capability to deposit multilayer structures for x-ray, neutron, and EUV optic applications through the development of a magnetron sputtering deposition system. A specific goal of this endeavor is to combine multilayer deposition technology with the replication process in order to enhance the MSFC's position as a world leader in the design of innovative X-ray instrumentation through the development of full shell replicated multilayer optics. The development of multilayer structures is absolutely necessary in order to advance the field of X-ray astronomy by pushing the limit for observing the universe to ever increasing photon energies (i. e. up to 200 keV or higher); well beyond Chandra (approx. 10 keV) and NuStar's (approx. 75 keV) capability. The addition of multilayer technology would significantly enhance the X-ray optics capability at MSFC and allow NASA to maintain its world leadership position in the development, fabrication and design of innovative X-ray instrumentation which would be the first of its kind by combining multilayer technology with the mirror replication process. This marriage of these technologies would allow astronomers to see the universe in a new light by pushing to higher energies that are out of reach with today's instruments.To this aim, a magnetron vacum sputter deposition system for the deposition of novel multilayer thin film X-ray optics is proposed. A significant secondary use of the vacuum deposition system includes the capability to fabricate multilayers for applications in the field of EUV optics for solar physics, neutron optics, and X-ray optics for a broad range of applications including medical imaging.

Dielectric properties of DC reactive magnetron sputtered Al2O3 thin films

International Nuclear Information System (INIS)

Prasanna, S.; Mohan Rao, G.; Jayakumar, S.; Kannan, M.D.; Ganesan, V.

2012-01-01

Alumina (Al 2 O 3 ) thin films were sputter deposited over well-cleaned glass and Si substrates by DC reactive magnetron sputtering under various oxygen gas pressures and sputtering powers. The composition of the films was analyzed by X-ray photoelectron spectroscopy and an optimal O/Al atomic ratio of 1.59 was obtained at a reactive gas pressure of 0.03 Pa and sputtering power of 70 W. X-ray diffraction results revealed that the films were amorphous until 550 °C. The surface morphology of the films was studied using scanning electron microscopy and the as-deposited films were found to be smooth. The topography of the as-deposited and annealed films was analyzed by atomic force microscopy and a progressive increase in the rms roughness of the films from 3.2 nm to 4.53 nm was also observed with increase in the annealing temperature. Al-Al 2 O 3 -Al thin film capacitors were then fabricated on glass substrates to study the effect of temperature and frequency on the dielectric property of the films. Temperature coefficient of capacitance, AC conductivity and activation energy were determined and the results are discussed. - Highlights: ► Al 2 O 3 thin films were deposited by DC reactive magnetron sputtering. ► The films were found to be amorphous up to annealing temperature of 550 C. ► An increase in rms roughness of the films was observed with annealing. ► Al-Al 2 O 3 -Al thin film capacitors were fabricated and dielectric constant was 7.5. ► The activation energy decreased with increase in frequency.

Dual Income Taxes

DEFF Research Database (Denmark)

Sørensen, Peter Birch

This paper discusses the principles and practices of dual income taxation in the Nordic countries. The first part of the paper explains the rationale and the historical background for the introduction of the dual income tax and describes the current Nordic tax practices. The second part...... of the paper focuses on the problems of taxing income from small businesses and the issue of corporate-personal tax integration under the dual income tax, considering alternative ways of dealing with these challenges. In the third and final part of the paper, I briefly discuss whether introducing a dual income...

Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering

Czech Academy of Sciences Publication Activity Database

Vlček, J.; Steidl, P.; Kohout, J.; Čerstvý, R.; Zeman, P.; Prokšová, S.; Peřina, Vratislav

2013-01-01

Roč. 215, JAN 25 (2013), s. 186-191 ISSN 0257-8972. [39th International Conference on Metallurgical Coatings and Thin Films (ICMTF). San Diego, California, 23.04.2012-27.04.2012] Institutional support: RVO:61389005 Keywords : Zr-B-C-N films * nanocomposite materials * pulsed magnetron sputtering * hard ness * high electrical conductivity * osidation resistance Subject RIV: BG - Nuclear, Atomic and Molecular Physics, Colliders Impact factor: 2.199, year: 2013 http://www.sciencedirect.com/science/article/pii/S0257897212010584

Fabrication and characterization of anatase/rutile–TiO2 thin films by magnetron sputtering: a review

Directory of Open Access Journals (Sweden)

Sakae Tanemura, Lei Miao, Wilfried Wunderlich, Masaki Tanemura, Yukimasa Mori, Shoichi Toh and Kenji Kaneko

2005-01-01

Full Text Available This review article summarizes briefly some important achievements of our recent reserach on anatase and/or rutile TiO2 thin films, fabricated by helicon RF magnetron sputtering, with good crystal quality and high density, and gives the-state-of-the-art of the knowledge on systematic interrelationship for fabrication conditions, crystal structure, composition, optical properties, and bactericidal abilities, and on the effective surface treatment to improve the optical reactivity of the obtained films.

Dual Diagnosis - Multiple Languages

Science.gov (United States)

... National Library of Medicine Comorbidity or dual diagnosis - Opioid addiction, part 9 - English PDF Comorbidity or dual diagnosis - Opioid addiction, part 9 - español (Spanish) PDF Comorbidity or dual ...

Composite SiOx/fluorocarbon plasma polymer films prepared by r.f. magnetron sputtering of SiO2 and PTFE

Czech Academy of Sciences Publication Activity Database

Pihosh, Y.; Biederman, H.; Slavínská, D.; Kousal, J.; Choukourov, A.; Trchová, Miroslava; Macková, Anna; Boldyryeva, Hanna

2006-01-01

Roč. 81, 1-4 (2006), s. 38-44 ISSN 0042-207X R&D Projects: GA MŠk OC 527.10; GA MŠk ME 553 Institutional research plan: CEZ:AV0Z40500505; CEZ:AV0Z10480505 Keywords : composite films * magnetron * sputtering Subject RIV: BL - Plasma and Gas Discharge Physics Impact factor: 0.834, year: 2006

Classification of posterior vitreous detachment

Science.gov (United States)

Kakehashi, Akihiro; Takezawa, Mikiko; Akiba, Jun

2014-01-01

Diagnosing a posterior vitreous detachment (PVD) is important for predicting the prognosis and determining the indication for vitreoretinal surgery in many vitreoretinal diseases. This article presents both classifications of a PVD by slit-lamp biomicroscopy and of a shallow PVD by optical coherence tomography (OCT). By biomicroscopy, the vitreous condition is determined based on the presence or absence of a PVD. The PVD then is classified as either a complete posterior vitreous detachment (C-PVD) or a partial posterior vitreous detachment (P-PVD). A C-PVD is further divided into a C-PVD with collapse and a C-PVD without collapse, while a P-PVD is divided into a P-PVD with shrinkage of the posterior hyaloid membrane (P-PVD with shrinkage) and a P-PVD without shrinkage of the posterior hyaloid membrane (P-PVD without shrinkage). A P-PVD without shrinkage has a subtype characterized by vitreous gel attachment through the premacular hole in a posterior hyaloid membrane to the macula (P-PVD without shrinkage [M]). By OCT, a shallow PVD is classified as the absence of a shallow PVD or as a shallow PVD. A shallow PVD is then subclassified as a shallow PVD without shrinkage of the posterior vitreous cortex, a shallow PVD with shrinkage of the posterior vitreous cortex, and a peripheral shallow PVD. A shallow PVD without shrinkage of the posterior vitreous cortex has two subtypes: an age-related shallow PVD and a perifoveal PVD associated with a macular hole. PMID:24376338

Preparation of transparent Cu{sub 2}Y{sub 2}O{sub 5} thin films by RF magnetron sputtering

Energy Technology Data Exchange (ETDEWEB)

Chiu, Te-Wei, E-mail: tewei@ntut.edu.tw; Chang, Chih-Hao; Yang, Li-Wei; Wang, Yung-Po

2015-11-01

Highlights: • Cu{sub 2}Y{sub 2}O{sub 5} thin films were prepared by RF magnetron sputtering. • Cu{sub 2}Y{sub 2}O{sub 5} thin films have high transmittance and antibacterial properties. • Mechanical properties of Cu{sub 2}Y{sub 2}O{sub 5} thin films were investigated. - Abstract: Cu{sub 2}Y{sub 2}O{sub 5} thin films were deposited on non-alkali glass substrates by RF magnetron sputtering. Its crystal structure, microstructure, optical property, mechanical property, and antibacterial activity were investigated by grazing-incidence X-ray diffraction, transmittance spectra, nanoindenter, and antibiotics test, respectively. A single-phase of Cu{sub 2}Y{sub 2}O{sub 5} was obtained while annealing at 700 °C in air and its optical transparency was >80% in the visible region. The hardness and elastic modulus of the film were 6.7 GPa and 82 GPa, respectively. Antibiotics testing result revealed that Cu{sub 2}Y{sub 2}O{sub 5} surface had a superior antibacterial performance even at a dark environment. Therefore, Cu{sub 2}Y{sub 2}O{sub 5} is a promising novel transparent antibacterial hard coating material.

Recent advances in Pt coating of microspheres by a batch magnetron sputtering process

International Nuclear Information System (INIS)

Hsieh, E.J.; Meyer, S.F.

1980-01-01

Some proposed inertial confinement fusion targets require high-Z, high density metal coatings on glass microspheres. Platinum, which satisfies the high-Z and density requirements, can be coated onto microspheres with a batch magnetron sputtering process incorporating oxygen as a dopant gas to prevent the microspheres from sticking. This paper outlines recent progress in three areas: First, the coating process has been improved; second, the oxygen content and resistivity of the oxygen doped platinum films are analyzed; and third, the roles oxygen may play in reducing microsphere sticking during sputtering are discussed in regard to cold welding, Van der Waals bonding, electrostatic sticking, and sintering

Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

Energy Technology Data Exchange (ETDEWEB)

Martines, E.; Zuin, M.; Cavazzana, R.; Antoni, V.; Serianni, G.; Spolaore, M.; Vianello, N. [Consorzio RFX, Padova (Italy); Adámek, J. [Institute of Plasma Physics AS CR, Prague (Czech Republic)

2014-10-15

A feedforward scheme is applied for drift waves control in a magnetized magnetron sputtering plasma. A system of driven electrodes collecting electron current in a limited region of the explored plasma is used to interact with unstable drift waves. Drift waves actually appear as electrostatic modes characterized by discrete wavelengths of the order of few centimeters and frequencies of about 100 kHz. The effect of external quasi-periodic, both in time and space, travelling perturbations is studied. Particular emphasis is given to the role played by the phase relation between the natural and the imposed fluctuations. It is observed that it is possible by means of localized electrodes, collecting currents which are negligible with respect to those flowing in the plasma, to transfer energy to one single mode and to reduce that associated to the others. Due to the weakness of the external action, only partial control has been achieved.

Spatiotemporal synchronization of drift waves in a magnetron sputtering plasma

International Nuclear Information System (INIS)

Martines, E.; Zuin, M.; Cavazzana, R.; Antoni, V.; Serianni, G.; Spolaore, M.; Vianello, N.; Adámek, J.

2014-01-01

A feedforward scheme is applied for drift waves control in a magnetized magnetron sputtering plasma. A system of driven electrodes collecting electron current in a limited region of the explored plasma is used to interact with unstable drift waves. Drift waves actually appear as electrostatic modes characterized by discrete wavelengths of the order of few centimeters and frequencies of about 100 kHz. The effect of external quasi-periodic, both in time and space, travelling perturbations is studied. Particular emphasis is given to the role played by the phase relation between the natural and the imposed fluctuations. It is observed that it is possible by means of localized electrodes, collecting currents which are negligible with respect to those flowing in the plasma, to transfer energy to one single mode and to reduce that associated to the others. Due to the weakness of the external action, only partial control has been achieved

Properties of reactively radio frequency-magnetron sputtered (Zr,Sn)TiO4 dielectric films

International Nuclear Information System (INIS)

Huang, C.-L.; Hsu, C.-H.

2004-01-01

Zirconium tin titanium oxide doped 1 wt % ZnO thin films on n-type Si substrate were deposited by rf magnetron sputtering at a fixed rf power of 350 W with various argon-oxygen (Ar/O 2 ) mixture and different substrate temperatures. Electrical properties and microstructures of ZnO-doped (Zr 0.8 Sn 0.2 )TiO 4 thin films prepared by rf magnetron sputtering on n-type Si(100) substrates at different Ar/O 2 ratios and substrate temperatures have been investigated. The surface structural and morphological characteristics analyzed by x-ray diffraction, scanning electron microscopy, and atomic force microscope were sensitive to the deposition conditions, such as Ar/O 2 ratio (100/0-80/20) and substrate temperature (350 deg. C-450 deg. C). The selected-area diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. All films exhibited ZST (111) orientation perpendicular to the substrate surface and the grain size as well as the deposition rate of the films increased with the increase of both the Ar partial pressure and the substrate temperature. At a Ar/O 2 ratio of 100/0, rf power level of 350 W and substrate temperature of 450 deg. C, the Zr 0.8 Sn 0.2 TiO 4 films with 6.44 μm thickness possess a dielectric constant of 42 (at 10 MHz), a dissipation factor of 0.065 (at 10 MHz), and a leakage current density of 2x10 -7 A/cm 2 at an electrical field of 1 kV/cm

In-situ TEM investigation of microstructural evolution in magnetron sputtered Al-Zr and Al-Zr-Si coatings during heat treatment

DEFF Research Database (Denmark)

Gudla, Visweswara Chakravarthy; Rechendorff, Kristian; Balogh, Zoltan Imre

2016-01-01

The magnetron sputtered Al–Zr and Al–Zr–Si coatings were heat treated in-situ in a transmission electron microscope as well as ex-situ to observe their annealing behaviour and phase transformations. The samples were heated up to a temperature of 550 °C and then cooled to room temperature. A layer...