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Sample records for p-type gallium nitride

  1. Tuning the surface Fermi level on p-type gallium nitride nanowires for efficient overall water splitting.

    Science.gov (United States)

    Kibria, M G; Zhao, S; Chowdhury, F A; Wang, Q; Nguyen, H P T; Trudeau, M L; Guo, H; Mi, Z

    2014-04-30

    Solar water splitting is one of the key steps in artificial photosynthesis for future carbon-neutral, storable and sustainable source of energy. Here we show that one of the major obstacles for achieving efficient and stable overall water splitting over the emerging nanostructured photocatalyst is directly related to the uncontrolled surface charge properties. By tuning the Fermi level on the nonpolar surfaces of gallium nitride nanowire arrays, we demonstrate that the quantum efficiency can be enhanced by more than two orders of magnitude. The internal quantum efficiency and activity on p-type gallium nitride nanowires can reach ~51% and ~4.0 mol hydrogen h(-1) g(-1), respectively. The nanowires remain virtually unchanged after over 50,000 μmol gas (hydrogen and oxygen) is produced, which is more than 10,000 times the amount of photocatalyst itself (~4.6 μmol). The essential role of Fermi-level tuning in balancing redox reactions and in enhancing the efficiency and stability is also elucidated.

  2. Gallium nitride optoelectronic devices

    Science.gov (United States)

    Chu, T. L.; Chu, S. S.

    1972-01-01

    The growth of bulk gallium nitride crystals was achieved by the ammonolysis of gallium monochloride. Gallium nitride single crystals up to 2.5 x 0.5 cm in size were produced. The crystals are suitable as substrates for the epitaxial growth of gallium nitride. The epitaxial growth of gallium nitride on sapphire substrates with main faces of (0001) and (1T02) orientations was achieved by the ammonolysis of gallium monochloride in a gas flow system. The grown layers had electron concentrations in the range of 1 to 3 x 10 to the 19th power/cu cm and Hall mobilities in the range of 50 to 100 sq cm/v/sec at room temperature.

  3. A novel technique based on a plasma focus device for nano-porous gallium nitride formation on P-type silicon

    Science.gov (United States)

    Sharifi Malvajerdi, S.; Salar Elahi, A.; Habibi, M.

    2017-04-01

    A new deposition formation was observed with a Mather-type Plasma Focus Device (MPFD). MPFD was unitized to fabricate porous Gallium Nitride (GaN) on p-type Silicon (Si) substrate with a (100) crystal orientation for the first time in a deposition process. GaN was deposited on Si with 4 and 7 shots. The samples were subjected to a 3 phase annealing procedure. First, the semiconductors were annealed in the PFD with nitrogen plasma shots after their deposition. Second, a thermal chemical vapor deposition annealed the samples for 1 h at 1050 °C by nitrogen gas at a pressure of 1 Pa. Finally, an electric furnace annealed the samples for 1 h at 1150 °C with continuous flow of nitrogen. Porous GaN structures were observed by Field emission scanning electron microscopy and atomic force microscopy. Furthermore, X-Ray diffraction analysis was carried out to determine the crystallinity of GaN after the samples were annealed. Energy-Dispersive X-Ray Spectroscopy indicated the amount of gallium, nitrogen, and oxygen due to the self-oxidation of the samples. Photoluminescence spectroscopy revealed emissions at 2.94 eV and 3.39 eV, which shows that hexagonal wurtzite crystal structures were formed.

  4. Gallium nitride electronics

    Science.gov (United States)

    Rajan, Siddharth; Jena, Debdeep

    2013-07-01

    In the past two decades, there has been increasing research and industrial activity in the area of gallium nitride (GaN) electronics, stimulated first by the successful demonstration of GaN LEDs. While the promise of wide band gap semiconductors for power electronics was recognized many years before this by one of the contributors to this issue (J Baliga), the success in the area of LEDs acted as a catalyst. It set the field of GaN electronics in motion, and today the technology is improving the performance of several applications including RF cell phone base stations and military radar. GaN could also play a very important role in reducing worldwide energy consumption by enabling high efficiency compact power converters operating at high voltages and lower frequencies. While GaN electronics is a rapidly evolving area with active research worldwide, this special issue provides an opportunity to capture some of the great advances that have been made in the last 15 years. The issue begins with a section on epitaxy and processing, followed by an overview of high-frequency HEMTs, which have been the most commercially successful application of III-nitride electronics to date. This is followed by review and research articles on power-switching transistors, which are currently of great interest to the III-nitride community. A section of this issue is devoted to the reliability of III-nitride devices, an area that is of increasing significance as the research focus has moved from not just high performance but also production-worthiness and long-term usage of these devices. Finally, a group of papers on new and relatively less studied ideas for III-nitride electronics, such as interband tunneling, heterojunction bipolar transistors, and high-temperature electronics is included. These areas point to new areas of research and technological innovation going beyond the state of the art into the future. We hope that the breadth and quality of articles in this issue will make it

  5. Indium gallium nitride multijunction solar cell simulation using silvaco atlas

    OpenAIRE

    Garcia, Baldomero

    2007-01-01

    This thesis investigates the potential use of wurtzite Indium Gallium Nitride as photovoltaic material. Silvaco Atlas was used to simulate a quad-junction solar cell. Each of the junctions was made up of Indium Gallium Nitride. The band gap of each junction was dependent on the composition percentage of Indium Nitride and Gallium Nitride within Indium Gallium Nitride. The findings of this research show that Indium Gallium Nitride is a promising semiconductor for solar cell use. United...

  6. Materials synthesis: Two-dimensional gallium nitride

    Science.gov (United States)

    Koratkar, Nikhil A.

    2016-11-01

    Graphene is used as a capping sheet to synthesize 2D gallium nitride by means of migration-enhanced encapsulation growth. This technique may allow the stabilization of 2D materials that are not amenable to synthesis by traditional methods.

  7. Single gallium nitride nanowire lasers.

    Science.gov (United States)

    Johnson, Justin C; Choi, Heon-Jin; Knutsen, Kelly P; Schaller, Richard D; Yang, Peidong; Saykally, Richard J

    2002-10-01

    There is much current interest in the optical properties of semiconductor nanowires, because the cylindrical geometry and strong two-dimensional confinement of electrons, holes and photons make them particularly attractive as potential building blocks for nanoscale electronics and optoelectronic devices, including lasersand nonlinear optical frequency converters. Gallium nitride (GaN) is a wide-bandgap semiconductor of much practical interest, because it is widely used in electrically pumped ultraviolet-blue light-emitting diodes, lasers and photodetectors. Recent progress in microfabrication techniques has allowed stimulated emission to be observed from a variety of GaN microstructures and films. Here we report the observation of ultraviolet-blue laser action in single monocrystalline GaN nanowires, using both near-field and far-field optical microscopy to characterize the waveguide mode structure and spectral properties of the radiation at room temperature. The optical microscope images reveal radiation patterns that correlate with axial Fabry-Perot modes (Q approximately 10(3)) observed in the laser spectrum, which result from the cylindrical cavity geometry of the monocrystalline nanowires. A redshift that is strongly dependent on pump power (45 meV microJ x cm(-2)) supports the idea that the electron-hole plasma mechanism is primarily responsible for the gain at room temperature. This study is a considerable advance towards the realization of electron-injected, nanowire-based ultraviolet-blue coherent light sources.

  8. Gallium Nitride Crystals: Novel Supercapacitor Electrode Materials.

    Science.gov (United States)

    Wang, Shouzhi; Zhang, Lei; Sun, Changlong; Shao, Yongliang; Wu, Yongzhong; Lv, Jiaxin; Hao, Xiaopeng

    2016-05-01

    A type of single-crystal gallium nitride mesoporous membrane is fabricated and its supercapacitor properties are demonstrated for the first time. The supercapacitors exhibit high-rate capability, stable cycling life at high rates, and ultrahigh power density. This study may expand the range of crystals as high-performance electrode materials in the field of energy storage.

  9. Optical characterization of gallium nitride

    NARCIS (Netherlands)

    Kirilyuk, Victoria

    2002-01-01

    Group III-nitrides have been considered a promising system for semiconductor devices since a few decades, first for blue- and UV-light emitting diodes, later also for high-frequency/high-power applications. Due to the lack of native substrates, heteroepitaxially grown III-nitride layers are usually

  10. Homogeneous dispersion of gallium nitride nanoparticles in a boron nitride matrix by nitridation with urea.

    Science.gov (United States)

    Kusunose, Takafumi; Sekino, Tohru; Ando, Yoichi

    2010-07-01

    A Gallium Nitride (GaN) dispersed boron nitride (BN) nanocomposite powder was synthesized by heating a mixture of gallium nitrate, boric acid, and urea in a hydrogen atmosphere. Before heat treatment, crystalline phases of urea, boric acid, and gallium nitrate were recognized, but an amorphous material was produced by heat treatment at 400 degrees C, and then was transformed into GaN and turbostratic BN (t-BN) by further heat treatment at 800 degrees C. TEM obsevations of this composite powder revealed that single nanosized GaN particles were homogeneously dispersed in a BN matrix. Homogeneous dispersion of GaN nanoparticles was thought to be attained by simultaneously nitriding gallium nitrate and boric acid to GaN and BN with urea.

  11. Schottky Contact of Gallium on p-Type Silicon

    Directory of Open Access Journals (Sweden)

    B.P. Modi

    2011-01-01

    Full Text Available The evolution of barrier at Schottky contact and its stabilization to value characterized by the barrier height and unambiguous measurement is still being curiously perused as they hold the key control and manufacture of tailor made Schottky devices for a host of existing and potential for future applications in electronics, optoelectronics and microwave devices. In this context, gallium – silicon Schottky diode has been fabricated and analyzed.

  12. Gallium nitride based logpile photonic crystals.

    Science.gov (United States)

    Subramania, Ganapathi; Li, Qiming; Lee, Yun-Ju; Figiel, Jeffrey J; Wang, George T; Fischer, Arthur J

    2011-11-09

    We demonstrate a nine-layer logpile three-dimensional photonic crystal (3DPC) composed of single crystalline gallium nitride (GaN) nanorods, ∼100 nm in size with lattice constants of 260, 280, and 300 nm with photonic band gap in the visible region. This unique GaN structure is created through a combined approach of a layer-by-layer template fabrication technique and selective metal organic chemical vapor deposition (MOCVD). These GaN 3DPC exhibit a stacking direction band gap characterized by strong optical reflectance between 380 and 500 nm. By introducing a "line-defect" cavity in the fifth (middle) layer of the 3DPC, a localized transmission mode with a quality factor of 25-30 is also observed within the photonic band gap. The realization of a group III nitride 3DPC with uniform features and a band gap at wavelengths in the visible region is an important step toward realizing complete control of the electromagnetic environment for group III nitride based optoelectronic devices.

  13. Ellipsometric study of silicon nitride on gallium arsenide

    Science.gov (United States)

    Alterovitz, S. A.; Bu-Abbud, G. H.; Woollam, J. A.; Liu, D.; Chung, Y.; Langer, D.

    1982-01-01

    A method for optimizing the sensitivity of ellipsometric measurements for thin dielectric films on semiconductors is described in simple physical terms. The technique is demonstrated for the case of sputtered silicon nitride films on gallium arsenide.

  14. Cathodoluminescence spectra of gallium nitride nanorods.

    Science.gov (United States)

    Tsai, Chia-Chang; Li, Guan-Hua; Lin, Yuan-Ting; Chang, Ching-Wen; Wadekar, Paritosh; Chen, Quark Yung-Sung; Rigutti, Lorenzo; Tchernycheva, Maria; Julien, François Henri; Tu, Li-Wei

    2011-12-14

    Gallium nitride [GaN] nanorods grown on a Si(111) substrate at 720°C via plasma-assisted molecular beam epitaxy were studied by field-emission electron microscopy and cathodoluminescence [CL]. The surface topography and optical properties of the GaN nanorod cluster and single GaN nanorod were measured and discussed. The defect-related CL spectra of GaN nanorods and their dependence on temperature were investigated. The CL spectra along the length of the individual GaN nanorod were also studied. The results reveal that the 3.2-eV peak comes from the structural defect at the interface between the GaN nanorod and Si substrate. The surface state emission of the single GaN nanorod is stronger as the diameter of the GaN nanorod becomes smaller due to an increased surface-to-volume ratio.

  15. Thickness dependent thermal conductivity of gallium nitride

    Science.gov (United States)

    Ziade, Elbara; Yang, Jia; Brummer, Gordie; Nothern, Denis; Moustakas, Theodore; Schmidt, Aaron J.

    2017-01-01

    As the size of gallium nitride (GaN) transistors is reduced in order to reach higher operating frequencies, heat dissipation becomes the critical bottleneck in device performance and longevity. Despite the importance of characterizing the physics governing the thermal transport in thin GaN films, the literature is far from conclusive. In this letter, we report measurements of thermal conductivity in a GaN film with thickness ranging from 15-1000 nm grown on 4H-SiC without a transition layer. Additionally, we measure the thermal conductivity in the GaN film when it is 1 μm-thick in the temperature range of 300 < T < 600 K and use a phonon transport model to explain the thermal conductivity in this film.

  16. Gallium Nitride Schottky betavoltaic nuclear batteries

    Energy Technology Data Exchange (ETDEWEB)

    Lu Min, E-mail: mlu2006@sinano.ac.c [Su zhou Institute of Nano-technology and Nano-bionics, CAS, Su zhou 215125 (China); Zhang Guoguang [China Institute of Atomic Energy, Beijing 102413 (China); Fu Kai; Yu Guohao [Su zhou Institute of Nano-technology and Nano-bionics, CAS, Su zhou 215125 (China); Su Dan; Hu Jifeng [China Institute of Atomic Energy, Beijing 102413 (China)

    2011-04-15

    Research highlights: {yields} Gallium Nitride nuclear batteries with Ni-63 are demonstrated for the first time. {yields} Open circuit voltage of 0.1 V and conversion efficiency of 0.32% have been obtained. {yields} The limited performance is due to thin effective energy deposition layer. {yields} The output power is expected to greatly increase with growing thick GaN films. -- Abstract: Gallium Nitride (GaN) Schottky betavoltaic nuclear batteries (GNBB) are demonstrated in our work for the first time. GaN films are grown on sapphire substrates by metalorganic chemical vapor deposition (MOCVD), and then GaN Schottky diodes are fabricated by normal micro-fabrication process. Nickel with mass number of 63 ({sup 63}Ni), which emits {beta} particles, is loaded on the GaN Schottky diodes to achieve GNBB. X-ray diffraction (XRD) and photoluminescence (PL) are carried out to investigate the crystal quality for the GaN films as grown. Current-voltage (I-V) characteristics shows that the GaN Schottky diodes are not jet broken down at -200 V due to consummate fabrication processes, and the open circuit voltage of the GNBB is 0.1 V and the short circuit current density is 1.2 nA cm{sup -2}. The limited performance of the GNBB is due to thin effective energy deposition layer, which is only 206 nm to absorb very small partial energy of the {beta} particles because of the relatively high dislocation density and carrier concentration. However, the conversion efficiency of 0.32% and charge collection efficiency (CCE) of 29% for the GNBB have been obtained. Therefore, the output power of the GNBB are expected to greatly increase with growing high quality thick GaN films.

  17. Ambient temperature deposition of gallium nitride/gallium oxynitride from a deep eutectic electrolyte, under potential control.

    Science.gov (United States)

    Sarkar, Sujoy; Sampath, S

    2016-05-11

    A ternary, ionically conducting, deep eutectic solvent based on acetamide, urea and gallium nitrate is reported for the electrodeposition of gallium nitride/gallium indium nitride under ambient conditions; blue and white light emitting photoluminescent deposits are obtained under potential control.

  18. Synthesis of gallium nitride nanostructures by nitridation of electrochemically deposited gallium oxide on silicon substrate

    Science.gov (United States)

    Ghazali, Norizzawati Mohd; Yasui, Kanji; Hashim, Abdul Manaf

    2014-12-01

    Gallium nitride (GaN) nanostructures were successfully synthesized by the nitridation of the electrochemically deposited gallium oxide (Ga2O3) through the utilization of a so-called ammoniating process. Ga2O3 nanostructures were firstly deposited on Si substrate by a simple two-terminal electrochemical technique at a constant current density of 0.15 A/cm2 using a mixture of Ga2O3, HCl, NH4OH and H2O for 2 h. Then, the deposited Ga2O3 sample was ammoniated in a horizontal quartz tube single zone furnace at various ammoniating times and temperatures. The complete nitridation of Ga2O3 nanostructures at temperatures of 850°C and below was not observed even the ammoniating time was kept up to 45 min. After the ammoniating process at temperature of 900°C for 15 min, several prominent diffraction peaks correspond to hexagonal GaN (h-GaN) planes were detected, while no diffraction peak of Ga2O3 structure was detected, suggesting a complete transformation of Ga2O3 to GaN. Thus, temperature seems to be a key parameter in a nitridation process where the deoxidization rate of Ga2O3 to generate gaseous Ga2O increase with temperature. The growth mechanism for the transformation of Ga2O3 to GaN was proposed and discussed. It was found that a complete transformation can not be realized without a complete deoxidization of Ga2O3. A significant change of morphological structures takes place after a complete transformation of Ga2O3 to GaN where the original nanorod structures of Ga2O3 diminish, and a new nanowire-like GaN structures appear. These results show that the presented method seems to be promising in producing high-quality h-GaN nanostructures on Si.

  19. Imaging Gallium Nitride High Electron Mobility Transistors to Identify Point Defects

    Science.gov (United States)

    2014-03-01

    REPORT TYPE AND DATES COVERED Master’s Thesis 4. TITLE AND SUBTITLE IMAGING GALLIUM NITRIDE HIGH ELECTRON MOBILITY TRANSISTORS TO IDENTIFY...Identification of these trends will assist in the improvement of gallium nitride HEMT fabrication processes leading to the development of more...reliable devices. 14. SUBJECT TERMS Electron microscopy, Gallium Nitride (GaN), high electron mobility transistor (HEMT

  20. Neutron detection using boron gallium nitride semiconductor material

    OpenAIRE

    Katsuhiro Atsumi; Yoku Inoue; Hidenori Mimura; Toru Aoki; Takayuki Nakano

    2014-01-01

    In this study, we developed a new neutron-detection device using a boron gallium nitride (BGaN) semiconductor in which the B atom acts as a neutron converter. BGaN and gallium nitride (GaN) samples were grown by metal organic vapor phase epitaxy, and their radiation detection properties were evaluated. GaN exhibited good sensitivity to α-rays but poor sensitivity to γ-rays. Moreover, we confirmed that electrons were generated in the depletion layer under neutron irradiation. This resulted in ...

  1. Homoepitaxial n-core: p-shell gallium nitride nanowires: HVPE overgrowth on MBE nanowires.

    Science.gov (United States)

    Sanders, Aric; Blanchard, Paul; Bertness, Kris; Brubaker, Matthew; Dodson, Christopher; Harvey, Todd; Herrero, Andrew; Rourke, Devin; Schlager, John; Sanford, Norman; Chiaramonti, Ann N; Davydov, Albert; Motayed, Abhishek; Tsvetkov, Denis

    2011-11-18

    We present the homoepitaxial growth of p-type, magnesium doped gallium nitride shells by use of halide vapor phase epitaxy (HVPE) on n-type gallium nitride nanowires grown by plasma-assisted molecular beam epitaxy (MBE). Scanning electron microscopy shows clear dopant contrast between the core and shell of the nanowire. The growth of magnesium doped nanowire shells shows little or no effect on the lattice parameters of the underlying nanowires, as measured by x-ray diffraction (XRD). Photoluminescence measurements of the nanowires show the appearance of sub-bandgap features in the blue and the ultraviolet, indicating the presence of acceptors. Finally, electrical measurements confirm the presence of electrically active holes in the nanowires.

  2. CRITICAL ASSESSMENT: Gallium nitride based visible light emitting diodes

    OpenAIRE

    Oliver, Rachel A.

    2016-01-01

    This is the author accepted manuscript. It is currently under an indefinite embargo pending publication by Maney Publishing. Solid state lighting based on light-emitting diodes (LEDs) is a technology with the potential to drastically reduce energy usage, made possible by the development of gallium nitride and its alloys. However, the nitride materials family exhibits high defect densities and, in the equilibrium wurtzite crystal phase, large piezo-electric and polarisation fields arising a...

  3. Synthesis of gallium nitride nanostructures by nitridation of electrochemically deposited gallium oxide on silicon substrate.

    Science.gov (United States)

    Ghazali, Norizzawati Mohd; Yasui, Kanji; Hashim, Abdul Manaf

    2014-01-01

    Gallium nitride (GaN) nanostructures were successfully synthesized by the nitridation of the electrochemically deposited gallium oxide (Ga2O3) through the utilization of a so-called ammoniating process. Ga2O3 nanostructures were firstly deposited on Si substrate by a simple two-terminal electrochemical technique at a constant current density of 0.15 A/cm(2) using a mixture of Ga2O3, HCl, NH4OH and H2O for 2 h. Then, the deposited Ga2O3 sample was ammoniated in a horizontal quartz tube single zone furnace at various ammoniating times and temperatures. The complete nitridation of Ga2O3 nanostructures at temperatures of 850°C and below was not observed even the ammoniating time was kept up to 45 min. After the ammoniating process at temperature of 900°C for 15 min, several prominent diffraction peaks correspond to hexagonal GaN (h-GaN) planes were detected, while no diffraction peak of Ga2O3 structure was detected, suggesting a complete transformation of Ga2O3 to GaN. Thus, temperature seems to be a key parameter in a nitridation process where the deoxidization rate of Ga2O3 to generate gaseous Ga2O increase with temperature. The growth mechanism for the transformation of Ga2O3 to GaN was proposed and discussed. It was found that a complete transformation can not be realized without a complete deoxidization of Ga2O3. A significant change of morphological structures takes place after a complete transformation of Ga2O3 to GaN where the original nanorod structures of Ga2O3 diminish, and a new nanowire-like GaN structures appear. These results show that the presented method seems to be promising in producing high-quality h-GaN nanostructures on Si.

  4. Gallium Nitride, Indium Nitride, and Heterostructure Development Using The MEAglow Growth System

    Science.gov (United States)

    Binsted, Peter W.

    This thesis presents an in depth study of semiconductor development using a new process termed Migration Enhanced Afterglow (MEAglow). The MEAglow growth reactor is housed in the Lakehead University Semiconductor Research Lab. Thin films of gallium nitride and indium nitride are produced as well as heterostructures comprised of these two films and their ternary alloy InGaN. MEAglow is a form of plasma enhanced chemical vapour deposition (PECVD) employing migration enhanced epitaxy (MEE). The heterostructure is being developed for a novel field effect transistor (FET) based on the tunnelling of charge carriers which alter the channel conductivity. The configuration of this unique III-Nitride device should allow the FET to function as normally off in either n-type or p-type operation. Due to the difficulties in growing low temperature GaN, test devices of this abstract design were not previously possible. Further details on the device operation and growth parameters are included. Samples produced by the research reactor were characterised through x-ray diffraction (XRD), ultraviolet-near infrared-visible spectroscopy (UV-Vis-NIR), Auger spectroscopy, scanning electron microscopy (SEM), and atomic force microscopy (AFM). Film growth is accomplished by an improved form of pulsed delivery Plasma Enhanced Chemical Vapour Deposition (PECVD). The reactor features a scalable hollow cathode type plasma source. Data obtained through characterisation is subjected to theoretical treatment which explains much not previously understood behaviour of the GaN films. Many challenges in III-Nitride film growth have been overcome during this research project. A method of developing structures consisting of InN and GaN within the same system has been proven.

  5. Gallium Nitride MMICs for mm-Wave Power Operation

    NARCIS (Netherlands)

    Quay, R.; Maroldt, S.; Haupt, C.; Heijningen, M. van; Tessmann, A.

    2009-01-01

    In this paper a Gallium Nitride MMIC technology for high-power amplifiers between 27 GHz and 101 GHz based on 150 nm- and 100 nm-gate technologies is presented. The GaN HEMT MMICs are designed using coplanar waveguide transmission-line-technology on 3-inch semi-insulating SiC substrates. The measure

  6. Neutron detection using boron gallium nitride semiconductor material

    Energy Technology Data Exchange (ETDEWEB)

    Atsumi, Katsuhiro [Department of Electrical and Electronic Engineering, Graduate School of Engineering, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561 (Japan); Inoue, Yoku; Nakano, Takayuki, E-mail: ttnakan@ipc.shizuoka.ac.jp [Department of Electrical and Materials Science, Graduate School of Engineering, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561 (Japan); Mimura, Hidenori; Aoki, Toru [Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011 (Japan)

    2014-03-01

    In this study, we developed a new neutron-detection device using a boron gallium nitride (BGaN) semiconductor in which the B atom acts as a neutron converter. BGaN and gallium nitride (GaN) samples were grown by metal organic vapor phase epitaxy, and their radiation detection properties were evaluated. GaN exhibited good sensitivity to α-rays but poor sensitivity to γ-rays. Moreover, we confirmed that electrons were generated in the depletion layer under neutron irradiation. This resulted in a neutron-detection signal after α-rays were generated by the capture of neutrons by the B atoms. These results prove that BGaN is useful as a neutron-detecting semiconductor material.

  7. Ultra-low threshold gallium nitride photonic crystal nanobeam laser

    Energy Technology Data Exchange (ETDEWEB)

    Niu, Nan, E-mail: nanniu@fas.harvard.edu; Woolf, Alexander; Wang, Danqing; Hu, Evelyn L. [School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States); Zhu, Tongtong; Oliver, Rachel A. [Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS (United Kingdom); Quan, Qimin [Rowland Institute at Harvard University, Cambridge, Massachusetts 02142 (United States)

    2015-06-08

    We report exceptionally low thresholds (9.1 μJ/cm{sup 2}) for room temperature lasing at ∼450 nm in optically pumped Gallium Nitride (GaN) nanobeam cavity structures. The nanobeam cavity geometry provides high theoretical Q (>100 000) with small modal volume, leading to a high spontaneous emission factor, β = 0.94. The active layer materials are Indium Gallium Nitride (InGaN) fragmented quantum wells (fQWs), a critical factor in achieving the low thresholds, which are an order-of-magnitude lower than obtainable with continuous QW active layers. We suggest that the extra confinement of photo-generated carriers for fQWs (compared to QWs) is responsible for the excellent performance.

  8. Amorphous carbon buffer layers for separating free gallium nitride films

    Science.gov (United States)

    Altakhov, A. S.; Gorbunov, R. I.; Kasharina, L. A.; Latyshev, F. E.; Tarala, V. A.; Shreter, Yu. G.

    2016-11-01

    The possibility of using amorphous diamond-like carbon (DLC) films for self-separation of gallium nitride (GaN) layers grown by hydride vapor-phase epitaxy has been analyzed. DLC films have been synthesized by plasma-enhanced chemical vapor deposition under low pressure on sapphire (Al2O3) substrates with a (0001) crystallographic orientation. The samples have been studied by the methods of Raman scattering and X-ray diffraction analysis. It is shown that thin DLC films affect only slightly the processes of nucleation and growth of gallium nitride films. Notably, the strength of the "GaN film-Al2O3" substrate interface decreases, which facilitates separation of the GaN layers.

  9. Neutron detection using boron gallium nitride semiconductor material

    Directory of Open Access Journals (Sweden)

    Katsuhiro Atsumi

    2014-03-01

    Full Text Available In this study, we developed a new neutron-detection device using a boron gallium nitride (BGaN semiconductor in which the B atom acts as a neutron converter. BGaN and gallium nitride (GaN samples were grown by metal organic vapor phase epitaxy, and their radiation detection properties were evaluated. GaN exhibited good sensitivity to α-rays but poor sensitivity to γ-rays. Moreover, we confirmed that electrons were generated in the depletion layer under neutron irradiation. This resulted in a neutron-detection signal after α-rays were generated by the capture of neutrons by the B atoms. These results prove that BGaN is useful as a neutron-detecting semiconductor material.

  10. Aqueous stability of Ga- and N-polar gallium nitride.

    Science.gov (United States)

    Foster, Corey M; Collazo, Ramon; Sitar, Zlatko; Ivanisevic, Albena

    2013-01-08

    The stability of III-nitride semiconductors in various solutions becomes important as researchers begin to integrate them into sensing platforms. This study quantitatively compares the stability of GaN surfaces with different polarities. This type of quantification is important because it represents the first step toward designing semiconductor material interfaces compatible with solution conditions. A stability study of Ga- and N-polar GaN was conducted by immersion of the surfaces in deionized H(2)O, pH 5, pH 9, and H(2)O(2) solutions for 7 days. Inductively coupled plasma mass spectrometry of the solutions was conducted to determine the amount of gallium leached from the surface. X-ray photoelectron spectroscopy and atomic force microscopy were used to compare the treated surfaces to untreated surfaces. The results show that both gallium nitride surface types exhibit the greatest stability in acidic and neutral solutions. Gallium polar surfaces were found to exhibit superior stability to nitrogen polar surfaces in the solutions studied. Our findings highlight the need for further research on surface passivation and functionalization techniques for polar III-nitride semiconductors.

  11. Thermal Plasma Synthesis of Crystalline Gallium Nitride Nanopowder from Gallium Nitrate Hydrate and Melamine

    Directory of Open Access Journals (Sweden)

    Tae-Hee Kim

    2016-02-01

    Full Text Available Gallium nitride (GaN nanopowder used as a blue fluorescent material was synthesized by using a direct current (DC non-transferred arc plasma. Gallium nitrate hydrate (Ga(NO33∙xH2O was used as a raw material and NH3 gas was used as a nitridation source. Additionally, melamine (C3H6N6 powder was injected into the plasma flame to prevent the oxidation of gallium to gallium oxide (Ga2O3. Argon thermal plasma was applied to synthesize GaN nanopowder. The synthesized GaN nanopowder by thermal plasma has low crystallinity and purity. It was improved to relatively high crystallinity and purity by annealing. The crystallinity is enhanced by the thermal treatment and the purity was increased by the elimination of residual C3H6N6. The combined process of thermal plasma and annealing was appropriate for synthesizing crystalline GaN nanopowder. The annealing process after the plasma synthesis of GaN nanopowder eliminated residual contamination and enhanced the crystallinity of GaN nanopowder. As a result, crystalline GaN nanopowder which has an average particle size of 30 nm was synthesized by the combination of thermal plasma treatment and annealing.

  12. Two-dimensional gallium nitride realized via graphene encapsulation

    Science.gov (United States)

    Al Balushi, Zakaria Y.; Wang, Ke; Ghosh, Ram Krishna; Vilá, Rafael A.; Eichfeld, Sarah M.; Caldwell, Joshua D.; Qin, Xiaoye; Lin, Yu-Chuan; Desario, Paul A.; Stone, Greg; Subramanian, Shruti; Paul, Dennis F.; Wallace, Robert M.; Datta, Suman; Redwing, Joan M.; Robinson, Joshua A.

    2016-11-01

    The spectrum of two-dimensional (2D) and layered materials `beyond graphene’ offers a remarkable platform to study new phenomena in condensed matter physics. Among these materials, layered hexagonal boron nitride (hBN), with its wide bandgap energy (~5.0-6.0 eV), has clearly established that 2D nitrides are key to advancing 2D devices. A gap, however, remains between the theoretical prediction of 2D nitrides `beyond hBN’ and experimental realization of such structures. Here we demonstrate the synthesis of 2D gallium nitride (GaN) via a migration-enhanced encapsulated growth (MEEG) technique utilizing epitaxial graphene. We theoretically predict and experimentally validate that the atomic structure of 2D GaN grown via MEEG is notably different from reported theory. Moreover, we establish that graphene plays a critical role in stabilizing the direct-bandgap (nearly 5.0 eV), 2D buckled structure. Our results provide a foundation for discovery and stabilization of 2D nitrides that are difficult to prepare via traditional synthesis.

  13. Growth of gallium nitride and indium nitride nanowires on conductive and flexible carbon cloth substrates.

    Science.gov (United States)

    Yang, Yi; Ling, Yichuan; Wang, Gongming; Lu, Xihong; Tong, Yexiang; Li, Yat

    2013-03-07

    We report a general strategy for synthesis of gallium nitride (GaN) and indium nitride (InN) nanowires on conductive and flexible carbon cloth substrates. GaN and InN nanowires were prepared via a nanocluster-mediated growth method using a home built chemical vapor deposition (CVD) system with Ga and In metals as group III precursors and ammonia as a group V precursor. Electron microscopy studies reveal that the group III-nitride nanowires are single crystalline wurtzite structures. The morphology, density and growth mechanism of these nanowires are determined by the growth temperature. Importantly, a photoelectrode fabricated by contacting the GaN nanowires through a carbon cloth substrate shows pronounced photoactivity for photoelectrochemical water oxidation. The ability to synthesize group III-nitride nanowires on conductive and flexible substrates should open up new opportunities for nanoscale photonic, electronic and electrochemical devices.

  14. Visible light metasurfaces based on gallium nitride high contrast gratings

    Science.gov (United States)

    Wang, Zhenhai; He, Shumin; Liu, Qifa; Wang, Wei

    2016-05-01

    We propose visible-light metasurfaces (VLMs) capable of serving as lens and beam deflecting element based on gallium nitride (GaN) high contrast gratings (HCGs). By precisely manipulating the wavefront of the transmitted light, we theoretically demonstrate an HCG focusing lens with transmissivity of 86.3%, and a VLM with beam deflection angle of 6.09° and transmissivity as high as 91.4%. The proposed all-dielectric metasurfaces are promising for GaN-based visible light-emitting diodes (LEDs), which would be robust and versatile for controlling the output light propagation and polarization, as well as enhancing the extraction efficiency of the LEDs.

  15. Fabrication of hexagonal gallium nitride films on silicon (111) substrates

    Institute of Scientific and Technical Information of China (English)

    YANG Li; XUE Chengshan; WANG Cuimei; LI Huaixiang; REN Yuwen

    2003-01-01

    Hexagonal gallium nitride films were successfully fabricated through ammoniating Ga2O3 films deposited on silicon (111 ) substrates by electrophoresis. The structure, composition, and surface morphology of the formed films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM),and transmission electron microscopy (TEM). The measurement results reveal that the polycrystalline GaN films with hexagonal wurtzite structure were successfully grown on the silicon (111) substrates. Preliminary results suggest that varying the ammoniating temperature has obvious effect on the quality of the GaN films formed with this method.

  16. Lasing action in gallium nitride quasicrystal nanorod arrays.

    Science.gov (United States)

    Chang, Shih-Pang; Sou, Kuok-Pan; Chen, Chieh-Han; Cheng, Yuh-Jen; Huang, Ji-Kai; Lin, Chung-Hsiang; Kuo, Hao-Chung; Chang, Chun-Yen; Hsieh, Wen-Feng

    2012-05-21

    We report the observation of lasing action from an optically pumped gallium nitride quasicrystal nanorod arrays. The nanorods were fabricated from a GaN substrate by patterned etching, followed by epitaxial regrowth. The nanorods were arranged in a 12-fold symmetric quasicrystal pattern. The regrowth grew hexagonal crystalline facets and core-shell multiple quantum wells (MQWs) on nanorods. Under optical pumping, multiple lasing peaks resembling random lasing were observed. The lasing was identified to be from the emission of MQWs on the nanorod sidewalls. The resonant spectrum and mode field of the 12-fold symmetric photonic quasicrystal nanorod arrays is discussed.

  17. Gallium nitride electrodes for membrane-based electrochemical biosensors.

    Science.gov (United States)

    Schubert, T; Steinhoff, G; von Ribbeck, H-G; Stutzmannn, M; Eickhoff, M; Tanaka, M

    2009-10-01

    We report on the deposition of planar lipid bilayers (supported membranes) on gallium nitride (GaN) electrodes for potential applications as membrane-based biosensors. The kinetics of the lipid membrane formation upon vesicle fusion were monitored by simultaneous measurements of resistance and capacitance of the membrane using AC impedance spectroscopy in the frequency range between 50 mHz and 50 kHz. We could identify a two-step process of membrane spreading and self-healing. Despite its relatively low resistance, the membrane can be modeled by a parallel combination of an ideal resistor and capacitor, indicating that the membrane efficiently blocks the diffusion of ions.

  18. Control of Defects in Aluminum Gallium Nitride ((Al)GaN) Films on Grown Aluminum Nitride (AlN) Substrates

    Science.gov (United States)

    2013-02-01

    like HEMTs . A nanolayer of AlGaN over GaN provides extra 2DEG charge density because of the piezoelectric effect of the AlGaN layer. The higher...Control of Defects in Aluminum Gallium Nitride ((Al) GaN ) Films on Grown Aluminum Nitride (AlN) Substrates by Iskander G. Batyrev, Chi-Chin Wu...Aluminum Gallium Nitride ((Al) GaN ) Films on Grown Aluminum Nitride (AlN) Substrates Iskander G. Batyrev and N. Scott Weingarten Weapons and

  19. Low-threshold indium gallium nitride quantum dot microcavity lasers

    Science.gov (United States)

    Woolf, Alexander J.

    Gallium nitride (GaN) microcavities with embedded optical emitters have long been sought after as visible light sources as well as platforms for cavity quantum electrodynamics (cavity QED) experiments. Specifically, materials containing indium gallium nitride (InGaN) quantum dots (QDs) offer an outstanding platform to study light matter interactions and realize practical devices, such as on-chip light emitting diodes and nanolasers. Inherent advantages of nitride-based microcavities include low surface recombination velocities, enhanced room-temperature performance (due to their high exciton binding energy, as high as 67 meV for InGaN QDs), and emission wavelengths in the blue region of the visible spectrum. In spite of these advantages, several challenges must be overcome in order to capitalize on the potential of this material system. Such diffculties include the processing of GaN into high-quality devices due to the chemical inertness of the material, low material quality as a result of strain-induced defects, reduced carrier recombination effciencies due to internal fields, and a lack of characterization of the InGaN QDs themselves due to the diffculty of their growth and therefore lack of development relative to other semiconductor QDs. In this thesis we seek to understand and address such issues by investigating the interaction of light coupled to InGaN QDs via a GaN microcavity resonator. Such coupling led us to the demonstration of the first InGaN QD microcavity laser, whose performance offers insights into the properties and current limitations of the nitride materials and their emitters. This work is organized into three main sections. Part I outlines the key advantages and challenges regarding indium gallium nitride (InGaN) emitters embedded within gallium nitride (GaN) optical microcavities. Previous work is also discussed which establishes context for the work presented here. Part II includes the fundamentals related to laser operation, including the

  20. Crystallographic alignment of high-density gallium nitride nanowire arrays.

    Science.gov (United States)

    Kuykendall, Tevye; Pauzauskie, Peter J; Zhang, Yanfeng; Goldberger, Joshua; Sirbuly, Donald; Denlinger, Jonathan; Yang, Peidong

    2004-08-01

    Single-crystalline, one-dimensional semiconductor nanostructures are considered to be one of the critical building blocks for nanoscale optoelectronics. Elucidation of the vapour-liquid-solid growth mechanism has already enabled precise control over nanowire position and size, yet to date, no reports have demonstrated the ability to choose from different crystallographic growth directions of a nanowire array. Control over the nanowire growth direction is extremely desirable, in that anisotropic parameters such as thermal and electrical conductivity, index of refraction, piezoelectric polarization, and bandgap may be used to tune the physical properties of nanowires made from a given material. Here we demonstrate the use of metal-organic chemical vapour deposition (MOCVD) and appropriate substrate selection to control the crystallographic growth directions of high-density arrays of gallium nitride nanowires with distinct geometric and physical properties. Epitaxial growth of wurtzite gallium nitride on (100) gamma-LiAlO(2) and (111) MgO single-crystal substrates resulted in the selective growth of nanowires in the orthogonal [1\\[Evec]0] and [001] directions, exhibiting triangular and hexagonal cross-sections and drastically different optical emission. The MOCVD process is entirely compatible with the current GaN thin-film technology, which would lead to easy scale-up and device integration.

  1. Ohmic contacts to Gallium Nitride materials

    Energy Technology Data Exchange (ETDEWEB)

    Greco, Giuseppe [Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII, n. 5 - Zona Industriale, 95121 Catania (Italy); Iucolano, Ferdinando [STMicroelectronics, Stradale Primosole 50, 95121 Catania (Italy); Roccaforte, Fabrizio, E-mail: fabrizio.roccaforte@imm.cnr.it [Consiglio Nazionale delle Ricerche—Istituto per la Microelettronica e Microsistemi (CNR-IMM), Strada VIII, n. 5 - Zona Industriale, 95121 Catania (Italy)

    2016-10-15

    Highlights: • Ohmic contacts are a crucial issue for wide band gap semiconductors devices. • This paper reviews the mechanisms of Ohmic contact formation on GaN-based materials. • Ti/Al-based contacts and multilayers (Ti/Al/X/Au) are used for n-type GaN. • Ni/Au-based bilayers are used for Ohmic contacts to p-type GaN. • Several parameters affect Ohmic contact formation to AlGaN/GaN heterostructures . • Au-free contacts are important for the integration of GaN technology on Si-fabs. - Abstract: In this review article, a comprehensive study of the mechanisms of Ohmic contact formation on GaN-based materials is presented. After a brief introduction on the physics of Ohmic contacts, a resume of the most important results obtained in literature is reported for each of the systems taken in consideration (n-type GaN, p-type GaN and AlGaN/GaN heterostructures). The optimal metallization schemes and processing conditions to obtain low resistance Ohmic contacts are presented, discussing the role of the single metals composing the stack and the modification induced by the thermal annealing, either on the metal layers or at the interface with GaN. Physical insights on the mechanism of Ohmic contact formation have been gained by correlating the temperature dependence of the electrical parameters with a morphological/structural analysis of the interface. In the case of the AlGaN/GaN systems, the influence of the heterostructure parameters on the Ohmic contacts has been taken into account adapting the classical thermionic field emission model to the presence of the two dimensional electron gas (2DEG). Finally, the state of the art of “Au-free” metallization to AlGaN/GaN heterostructures is also presented, being this latter a relevant topic for the integration of GaN technology on large scale Silicon devices fabs.

  2. Ohmic contacts to Gallium Nitride materials

    Science.gov (United States)

    Greco, Giuseppe; Iucolano, Ferdinando; Roccaforte, Fabrizio

    2016-10-01

    In this review article, a comprehensive study of the mechanisms of Ohmic contact formation on GaN-based materials is presented. After a brief introduction on the physics of Ohmic contacts, a resume of the most important results obtained in literature is reported for each of the systems taken in consideration (n-type GaN, p-type GaN and AlGaN/GaN heterostructures). The optimal metallization schemes and processing conditions to obtain low resistance Ohmic contacts are presented, discussing the role of the single metals composing the stack and the modification induced by the thermal annealing, either on the metal layers or at the interface with GaN. Physical insights on the mechanism of Ohmic contact formation have been gained by correlating the temperature dependence of the electrical parameters with a morphological/structural analysis of the interface. In the case of the AlGaN/GaN systems, the influence of the heterostructure parameters on the Ohmic contacts has been taken into account adapting the classical thermionic field emission model to the presence of the two dimensional electron gas (2DEG). Finally, the state of the art of "Au-free" metallization to AlGaN/GaN heterostructures is also presented, being this latter a relevant topic for the integration of GaN technology on large scale Silicon devices fabs.

  3. Oligonuclear gallium nitrogen cage compounds: molecular intermediates on the way from gallium hydrazides to gallium nitride.

    Science.gov (United States)

    Uhl, Werner; Abel, Thomas; Hagemeier, Elke; Hepp, Alexander; Layh, Marcus; Rezaeirad, Babak; Luftmann, Heinrich

    2011-01-03

    Gallium hydrazides are potentially applicable as facile starting compounds for the generation of GaN by thermolysis. The decomposition pathways are, however, complicated and depend strongly on the substituents attached to the gallium atoms and the hydrazido groups. This paper describes some systematic investigations into the thermolysis of the gallium hydrazine adduct Bu(t)(3)Ga←NH(2)-NHMe (1a) and the dimeric gallium hydrazides [R(2)Ga(N(2)H(2)R')](2) (2b, R = Bu(t), R' = Bu(t); 2c, R = Pr(i), R' = Ph; 2d, R = Me, R' = Bu(t)) which have four- or five-membered heterocycles in their molecular cores. Heating of the adduct 1a to 170 °C gave the heterocyclic compound Bu(t)(2)Ga(μ-NH(2))[μ-N(Me)-N(=CH(2))]GaBu(t)(2) (3) by cleavage of N-N bonds and rearrangement. 3 was further converted at 400 °C into the tetrameric gallium cyanide (Bu(t)(2)GaCN)(4) (4). The thermolysis of the hydrazide (Bu(t)(2)Ga)(2)(NH-NHBu(t))(2) (2b) at temperatures between 270 and 420 °C resulted in cleavage of all N-N bonds and the formation of an octanuclear gallium imide, (Bu(t)GaNH)(8) (6). The trimeric dialkylgallium amide (Bu(t)(2)GaNH(2))(3) (5) was isolated as an intermediate. Thermolysis of the hydrazides (Pr(i)(2)Ga)(2)(NH-NHPh)(NH(2)-NPh) (2c) and (Me(2)Ga)(2)(NH-NHBu(t))(2) (2d) proceeded in contrast with retention of the N-N bonds and afforded a variety of novel gallium hydrazido cage compounds with four gallium atoms and up to four hydrazido groups in a single molecule: (Pr(i)Ga)(4)(NH-NPh)(3)NH (7), (MeGa)(4)(NH-NBu(t))(4) (8), (MeGa)(4)(NH-NBu(t))(3)NBu(t) (9), and (MeGa)(4)(NHNBu(t))(3)NH (10). Partial hydrolysis gave reproducibly the unique octanuclear mixed hydrazido oxo compound (MeGa)(8)(NHNBu(t))(4)O(4) (11).

  4. Native gallium adatoms discovered on atomically-smooth gallium nitride surfaces at low temperature.

    Science.gov (United States)

    Alam, Khan; Foley, Andrew; Smith, Arthur R

    2015-03-11

    In advanced compound semiconductor devices, such as in quantum dot and quantum well systems, detailed atomic configurations at the growth surfaces are vital in determining the structural and electronic properties. Therefore, it is important to investigate the surface reconstructions in order to make further technological advancements. Usually, conventional semiconductor surfaces (e.g., arsenides, phosphides, and antimonides) are highly reactive due to the existence of a high density of group V (anion) surface dangling bonds. However, in the case of nitrides, group III rich growth conditions in molecular beam epitaxy are usually preferred leading to group III (Ga)-rich surfaces. Here, we use low-temperature scanning tunneling microscopy to reveal a uniform distribution of native gallium adatoms with a density of 0.3%-0.5% of a monolayer on the clean, as-grown surface of nitrogen polar GaN(0001̅) having the centered 6 × 12 reconstruction. Unseen at room temperature, these Ga adatoms are strongly bound to the surface but move with an extremely low surface diffusion barrier and a high density saturation coverage in thermodynamic equilibrium with Ga droplets. Furthermore, the Ga adatoms reveal an intrinsic surface chirality and an asymmetric site occupation. These observations can have important impacts in the understanding of gallium nitride surfaces.

  5. Two-dimensional dopant profiling of gallium nitride p–n junctions by scanning capacitance microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Lamhamdi, M. [GREMAN UMR 7347-Université de Tours, 10 Rue Thales de Milet, BP 7155, 37071 Tours (France); Ecole national des sciences appliquées khouribga, Université Hassan 1er, 26000 Settat (Morocco); Cayrel, F. [GREMAN UMR 7347-Université de Tours, 10 Rue Thales de Milet, BP 7155, 37071 Tours (France); Frayssinet, E. [CRHEA-CNRS, Rue Bernard Grégory, Sophia Antipolis, 06560 Valbonne (France); Bazin, A.E.; Yvon, A.; Collard, E. [STMicroelectronics, 16 Rue Pierre et Marie Curie, BP 7155, 37071 Tours (France); Cordier, Y. [CRHEA-CNRS, Rue Bernard Grégory, Sophia Antipolis, 06560 Valbonne (France); Alquier, D. [GREMAN UMR 7347-Université de Tours, 10 Rue Thales de Milet, BP 7155, 37071 Tours (France)

    2016-04-01

    Two-dimensional imaging of dopant profiles for n and p-type regions are relevant for the development of new power semiconductors, especially for gallium nitride (GaN) for which classical profiling techniques are not adapted. This is a challenging task since it needs a technique with simultaneously good sensitivity, high spatial resolution and high dopant gradient resolution. To face these challenges, scanning capacitance microscopy combined with Atomic Force Microscopy is a good candidate, presenting reproducible results, as demonstrated in literature. In this work, we attempt to distinguish reliably and qualitatively the various doping concentrations and type at p–n and unipolar junctions. For both p–n and unipolar junctions three kinds of samples were prepared and measured separately. The space-charge region of the p–n metallurgical junction, giving rise to different contrasts under SCM imaging, is clearly observed, enlightening the interest of the SCM technique.

  6. Surface modifications caused by a swift heavy ion irradiation on crystalline p-type gallium antimonide

    Energy Technology Data Exchange (ETDEWEB)

    Jadhav, Vidya, E-mail: vj1510@yahoo.com

    2015-09-01

    Surface modifications caused by a swift heavy ion irradiation on crystalline p-type gallium antimonide crystal have been reported. Single crystal, 1 0 0〉 orientations and ∼500 μm thick p-type GaSb samples with carrier concentration of 3.30 × 10{sup 17} cm{sup −3} were irradiated at 100 MeV Fe{sup 7+} ions. We have used 15UD Pelletron facilities at IUAC with varying fluences of 5 × 10{sup 10}–1 × 10{sup 14} ions cm{sup −2}. The effects of irradiation on these samples have been investigated using, spectroscopic ellipsometry, atomic force microscopy and ultraviolet–visible–NIR spectroscopy techniques. Ellipsometry parameters, psi (Ψ) and delta (Δ) for the unirradiated sample and samples irradiated with different fluences were recorded. The data were fit to a three phase model to determine the refractive index and extinction coefficient. The refractive index and extinction coefficient for various fluences in ultraviolet, visible, and infrared, regimes were evaluated. Atomic force microscopy has been used to study these surface modifications. In order to have more statistical information about the surface, we have plotted the height structure histogram for all the samples. For unirradiated sample, we observed the Gaussian fitting. This result indicates the more ordered height structure symmetry. Whereas for the sample irradiated with the fluence of 1 × 10{sup 13}, 5 × 10{sup 13} and 1 × 10{sup 14} ions cm{sup −2}, we observed the scattered data. The width of the histogram for samples irradiated up to the fluence of 1 × 10{sup 13} ion cm{sup −2} was found to be almost same however it decreased at higher fluence. UV reflectance spectra of the sample irradiated with increasing fluences exhibit three peaks at 292, 500 and 617 nm represent the high energy GaSb; E{sub 1}, E{sub 1} + Δ and E{sub 2} band gaps in all irradiated samples.

  7. Localized surface phonon polariton resonances in polar gallium nitride

    Energy Technology Data Exchange (ETDEWEB)

    Feng, Kaijun, E-mail: kfeng@nd.edu; Islam, S. M.; Verma, Jai; Hoffman, Anthony J. [Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556 (United States); Streyer, William; Wasserman, Daniel [Department of Electrical and Computer Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801 (United States); Jena, Debdeep [Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556 (United States); School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14850 (United States)

    2015-08-24

    We demonstrate the excitation of localized surface phonon polaritons in an array of sub-diffraction pucks fabricated in an epitaxial layer of gallium nitride (GaN) on a silicon carbide (SiC) substrate. The array is characterized via polarization- and angle-dependent reflection spectroscopy in the mid-infrared, and coupling to several localized modes is observed in the GaN Reststrahlen band (13.4–18.0 μm). The same structure is simulated using finite element methods and the charge density of the modes are studied; transverse dipole modes are identified for the transverse electric and magnetic polarizations and a quadrupole mode is identified for the transverse magnetic polarization. The measured mid-infrared spectrum agrees well with numerically simulated spectra. This work could enable optoelectronic structures and devices that support surface modes at mid- and far-infrared wavelengths.

  8. Modeling and simulation of bulk gallium nitride power semiconductor devices

    Directory of Open Access Journals (Sweden)

    G. Sabui

    2016-05-01

    Full Text Available Bulk gallium nitride (GaN power semiconductor devices are gaining significant interest in recent years, creating the need for technology computer aided design (TCAD simulation to accurately model and optimize these devices. This paper comprehensively reviews and compares different GaN physical models and model parameters in the literature, and discusses the appropriate selection of these models and parameters for TCAD simulation. 2-D drift-diffusion semi-classical simulation is carried out for 2.6 kV and 3.7 kV bulk GaN vertical PN diodes. The simulated forward current-voltage and reverse breakdown characteristics are in good agreement with the measurement data even over a wide temperature range.

  9. Gallium Nitride Electrical Characteristics Extraction and Uniformity Sorting

    Directory of Open Access Journals (Sweden)

    Shyr-Long Jeng

    2015-01-01

    Full Text Available This study examined the output electrical characteristics—current-voltage (I-V output, threshold voltage, and parasitic capacitance—of novel gallium nitride (GaN power transistors. Experimental measurements revealed that both enhanced- and depletion-mode GaN field-effect transistors (FETs containing different components of identical specifications yielded varied turn-off impedance; hence, the FET quality was inconsistent. Establishing standardized electrical measurements can provide necessary information for designers, and measuring transistor electrical characteristics establishes its equivalent-circuit model for circuit simulations. Moreover, high power output requires multiple parallel power transistors, and sorting the difference between similar electrical characteristics is critical in a power system. An isolated gate driver detection method is proposed for sorting the uniformity from the option of the turn-off characteristic. In addition, an equivalent-circuit model for GaN FETs is established on the basis of the measured electrical characteristics and verified experimentally.

  10. Low temperature solid-state synthesis of nanocrystalline gallium nitride

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Liangbiao, E-mail: wlb6641@163.com [Hefei National Laboratory for Physical Science at Microscale and Department of Chemistry, University of Science and Technology of China, Hefei, Anhui 230026 (China); Shi, Liang; Li, Qianwen; Si, Lulu; Zhu, Yongchun; Qian, Yitai [Hefei National Laboratory for Physical Science at Microscale and Department of Chemistry, University of Science and Technology of China, Hefei, Anhui 230026 (China)

    2012-11-15

    Graphical abstract: Display Omitted Highlights: ► GaN nanocrystalline was prepared via a solid-state reacion at relatively low temperature. ► The sizes and crystallinities of the GaN samples obtained at the different temperatures are investigated. ► The GaN sample has oxidation resistance and good thermal stability below 1000 °C. -- Abstract: Nanocrystalline gallium nitride was synthesized by a solid-state reaction of metallic magnesium powder, gallium sesquioxide and sodium amide in a stainless steel autoclave at a relatively low temperature (400–550 °C). The structures and morphologies of the obtained products were derived from X-ray powder diffraction (XRD) and transmission electron microscopy (TEM). XRD patterns indicated that the products were hexagonal GaN (JCPDS card no. 76-0703). The influence of reaction temperature on size of the products was studied by XRD and TEM. Furthermore, the thermal stability and oxidation resistance of the nanocrystalline GaN were also investigated. It had good thermal stability and oxidation resistance below 800 °C in air.

  11. Manganese Atom Ordered Monolayer on Wurtzite Gallium Nitride

    Science.gov (United States)

    Chinchore, Abhijit; Wang, Kangkang; Lin, Wenzhi; Pak, Jeongihm; Liu, Yinghao; Smith, Arthur

    2009-03-01

    While transition-metal-doped gallium nitride (GaN) thin films have been explored as potential dilute magnetic semiconductor bulk layers, the structural and magnetic effects of various transition metal adatoms on GaN surfaces are not even well understood. In this work, we investigate the sub-monolayer deposition of manganese (Mn) onto the N-polar wurtzite GaN (000-1) 1x1 surface. The growth is monitored in-situ using reflection high energy electron diffraction (RHEED). A fresh GaN(000-1) 1x1 surface is prepared by rf nitrogen plasma-assisted MBE followed by annealing to remove excess gallium adatoms. The atomically flat GaN surface, held at 200^o C, is then exposed to submonolayer doses of Mn. The deposition rate is maintained at 0.007 ML per second, and a 3x pattern develops along [10-10]; whereas, only 1x is seen along [11-20]. Analysis of the RHEED pattern and subsequent modeling indicates a 3 x3 R 30^o structure consisting of 2/3 ML Mn atoms in a row-like arrangement having spacing 3a/2 along rows and 3a/2 between rows. Scanning tunneling microscopy/spectroscopy studies are currently underway to explore this surface further. This work is supported by DOE (Grant No.DE-FG02-06ER46317) and NSF (Grant No. 0730257).

  12. Monte Carlo Evaluation of Tritium Beta Spectrum Energy Deposition in Gallium Nitride (GaN) Direct Energy Conversion Devices

    Science.gov (United States)

    2014-09-01

    Monte Carlo Evaluation of Tritium Beta Spectrum Energy Deposition in Gallium Nitride (GaN) Direct Energy Conversion Devices by Marc Litz...MD 20783-1138 ARL-TR-7082 September 2014 Monte Carlo Evaluation of Tritium Beta Spectrum Energy Deposition in Gallium Nitride (GaN... Tritium Beta Spectrum Energy Deposition in Gallium Nitride (GaN) Direct Energy Conversion Devices 5a. CONTRACT NUMBER 5b. GRANT NUMBER 5c. PROGRAM

  13. Platinum nanoparticles on gallium nitride surfaces: effect of semiconductor doping on nanoparticle reactivity.

    Science.gov (United States)

    Schäfer, Susanne; Wyrzgol, Sonja A; Caterino, Roberta; Jentys, Andreas; Schoell, Sebastian J; Hävecker, Michael; Knop-Gericke, Axel; Lercher, Johannes A; Sharp, Ian D; Stutzmann, Martin

    2012-08-01

    Platinum nanoparticles supported on n- and p-type gallium nitride (GaN) are investigated as novel hybrid systems for the electronic control of catalytic activity via electronic interactions with the semiconductor support. In situ oxidation and reduction were studied with high pressure photoemission spectroscopy. The experiments revealed that the underlying wide-band-gap semiconductor has a large influence on the chemical composition and oxygen affinity of supported nanoparticles under X-ray irradiation. For as-deposited Pt cuboctahedra supported on n-type GaN, a higher fraction of oxidized surface atoms was observed compared to cuboctahedral particles supported on p-type GaN. Under an oxygen atmosphere, immediate oxidation was recorded for nanoparticles on n-type GaN, whereas little oxidation was observed for nanoparticles on p-type GaN. Together, these results indicate that changes in the Pt chemical state under X-ray irradiation depend on the type of GaN doping. The strong interaction between the nanoparticles and the support is consistent with charge transfer of X-ray photogenerated free carriers at the semiconductor-nanoparticle interface and suggests that GaN is a promising wide-band-gap support material for photocatalysis and electronic control of catalysis.

  14. Nanoscale optical properties of indium gallium nitride/gallium nitride nanodisk-in-rod heterostructures.

    Science.gov (United States)

    Zhou, Xiang; Lu, Ming-Yen; Lu, Yu-Jung; Jones, Eric J; Gwo, Shangjr; Gradečak, Silvija

    2015-03-24

    III-nitride based nanorods and nanowires offer great potential for optoelectronic applications such as light emitting diodes or nanolasers. We report nanoscale optical studies of InGaN/GaN nanodisk-in-rod heterostructures to quantify uniformity of light emission on the ensemble level, as well as the emission characteristics from individual InGaN nanodisks. Despite the high overall luminescence efficiency, spectral and intensity inhomogeneities were observed and directly correlated to the compositional variations among nanodisks and to the presence of structural defect, respectively. Observed light quenching is correlated to type I1 stacking faults in InGaN nanodisks, and the mechanisms for stacking fault induced nonradiative recombinations are discussed in the context of band structure around stacking faults and Fermi level pinning at nanorod surfaces. Our results highlight the importance of controlling III-nitride nanostructure growths to further reduce defect formation and ensure compositional homogeneity for optoelectronic devices with high efficiencies and desirable spectrum response.

  15. Studies on the reliability of ni-gate aluminum gallium nitride / gallium nitride high electron mobility transistors using chemical deprocessing

    Science.gov (United States)

    Whiting, Patrick Guzek

    Aluminum Gallium Nitride / Gallium Nitride High Electron Mobility Transistors are becoming the technology of choice for applications where hundreds of volts need to be applied in a circuit at frequencies in the hundreds of gigahertz, such as microwave communications. However, because these devices are very new, their reliability in the field is not well understood, partly because of the stochastic nature of the defects which form as a result of their operation. Many analytical techniques are not well suited to the analysis of these defects because they sample regions of the device which are either too small or too large for accurate observation. The use of chemical deprocessing in addition to surface-sensitive analysis techniques such as Scanning Electron Microscopy and Scanning Probe Microscopy can be utilized in the analysis of defect formation in devices formed with nickel gates. Hydrofluoric acid is used to etch the passivation nitride which covers the semiconducting layer of the transistor. A metal etch utilizing FeCN/KI is used to etch the ohmic and gate contacts of the device and a long exposure in various solvent solutions is used to remove organic contaminants, exposing the surface of the semiconducting layer for analysis. Deprocessing was used in conjunction with a variety of metrology techniques to analyze three different defects. One of these defects is a nanoscale crack which emanates from metal inclusions formed during alloying of the ohmic contacts of the device prior to use in the field, could impact the yield of production-level manufacturing of these devices. This defect also appears to grow, in some cases, during electrostatic stressing. Another defect, a native oxide at the surface of the semiconducting layer which appears to react in the presence of an electric field, has not been observed before during post-mortem analysis of degraded devices. It could play a major part in the degredation of the gate contact during high-field, off

  16. A gallium nitride single-photon source operating at 200 K.

    Science.gov (United States)

    Kako, Satoshi; Santori, Charles; Hoshino, Katsuyuki; Götzinger, Stephan; Yamamoto, Yoshihisa; Arakawa, Yasuhiko

    2006-11-01

    Fundamentally secure quantum cryptography has still not seen widespread application owing to the difficulty of generating single photons on demand. Semiconductor quantum-dot structures have recently shown great promise as practical single-photon sources, and devices with integrated optical cavities and electrical-carrier injection have already been demonstrated. However, a significant obstacle for the application of commonly used III-V quantum dots to quantum-information-processing schemes is the requirement of liquid-helium cryogenic temperatures. Epitaxially grown gallium nitride quantum dots embedded in aluminium nitride have the potential for operation at much higher temperatures. Here, we report triggered single-photon emission from gallium nitride quantum dots at temperatures up to 200 K, a temperature easily reachable with thermo-electric cooling. Gallium nitride quantum dots also open a new wavelength region in the blue and near-ultraviolet portions of the spectrum for single-photon sources.

  17. In vitro bio-functionality of gallium nitride sensors for radiation biophysics.

    Science.gov (United States)

    Hofstetter, Markus; Howgate, John; Schmid, Martin; Schoell, Sebastian; Sachsenhauser, Matthias; Adigüzel, Denis; Stutzmann, Martin; Sharp, Ian D; Thalhammer, Stefan

    2012-07-27

    There is an increasing interest in the integration of hybrid bio-semiconductor systems for the non-invasive evaluation of physiological parameters. High quality gallium nitride and its alloys show promising characteristics to monitor cellular parameters. Nevertheless, such applications not only request appropriate sensing capabilities but also the biocompatibility and especially the biofunctionality of materials. Here we show extensive biocompatibility studies of gallium nitride and, for the first time, a biofunctionality assay using ionizing radiation. Analytical sensor devices are used in medical settings, as well as for cell- and tissue engineering. Within these fields, semiconductor devices have increasingly been applied for online biosensing on a cellular and tissue level. Integration of advanced materials such as gallium nitride into these systems has the potential to increase the range of applicability for a multitude of test devices and greatly enhance sensitivity and functionality. However, for such applications it is necessary to optimize cell-surface interactions and to verify the biocompatibility of the semiconductor. In this work, we present studies of mouse fibroblast cell activity grown on gallium nitride surfaces after applying external noxa. Cell-semiconductor hybrids were irradiated with X-rays at air kerma doses up to 250 mGy and the DNA repair dynamics, cell proliferation, and cell growth dynamics of adherent cells were compared to control samples. The impact of ionizing radiation on DNA, along with the associated cellular repair mechanisms, is well characterized and serves as a reference tool for evaluation of substrate effects. The results indicate that gallium nitride does not require specific surface treatments to ensure biocompatibility and suggest that cell signaling is not affected by micro-environmental alterations arising from gallium nitride-cell interactions. The observation that gallium nitride provides no bio-functional influence on

  18. Cell behavior on gallium nitride surfaces: peptide affinity attachment versus covalent functionalization.

    Science.gov (United States)

    Foster, Corey M; Collazo, Ramon; Sitar, Zlatko; Ivanisevic, Albena

    2013-07-02

    Gallium nitride is a wide band gap semiconductor that demonstrates a unique set of optical and electrical properties as well as aqueous stability and biocompatibility. This combination of properties makes gallium nitride a strong candidate for use in chemical and biological applications such as sensors and neural interfaces. Molecular modification can be used to enhance the functionality and properties of the gallium nitride surface. Here, gallium nitride surfaces were functionalized with a PC12 cell adhesion promoting peptide using covalent and affinity driven attachment methods. The covalent scheme proceeded by Grignard reaction and olefin metathesis while the affinity driven scheme utilized the recognition peptide isolated through phage display. This study shows that the method of attaching the adhesion peptide influences PC12 cell adhesion and differentiation as measured by cell density and morphological analysis. Covalent attachment promoted monolayer and dispersed cell adhesion while affinity driven attachment promoted multilayer cell agglomeration. Higher cell density was observed on surfaces modified using the recognition peptide. The results suggest that the covalent and affinity driven attachment methods are both suitable for promoting PC12 cell adhesion to the gallium nitride surface, though each method may be preferentially suited for distinct applications.

  19. Growth and fabrication of gallium nitride and indium gallium nitride-based optoelectronic devices

    Science.gov (United States)

    Berkman, Erkan Acar

    In this study, heteroepitaxial growth of III-Nitrides was performed by metalorganic chemical vapor deposition (MOCVD) technique on (0001) Al 2O3 substrates to develop GaN and InxGa1-x N based optoelectronic devices. Comprehensive experimental studies on emission and relaxation mechanisms of InxGa1-xN quantum wells (QWs) and InxGa 1-xN single layers were performed. The grown films were characterized by x-ray diffraction (XRD), Hall Effect measurements, photoluminescence measurements (PL) and transmission electron microscopy (TEM). An investigation on the effect of number and width of QWs on PL emission properties of InxGa 1-xN single QWs and multi-quantum wells (MQW) was conducted. The experimental results were explained by the developed theoretical bandgap model. The study on the single layer InxGa1-xN films within and beyond critical layer thickness (CLT) demonstrated that thick InxGa 1-xN films display simultaneous presence of strained and (partially) relaxed layers. The In incorporation into the lattice was observed to be dependent on the strain state of the film. The findings on InxGa1-xN QWs and single layers were implemented in the development of InxGa1-xN based LEDs and photodiodes, respectively. The as-grown samples were fabricated using conventional lithography techniques into various optoelectronic devices including long wavelength LEDs, dichromatic monolithic white LEDs, and p-i-n photodiodes. Emission from InxGa1-xN/GaN MQW LEDs at wavelengths as long as 625nm was demonstrated. This is one of the longest peak emission wavelengths reported for MOCVD grown InxGa1-xN MQW structures. Dichromatic white emission in LEDs was realized by utilizing two InGaN MQW active regions emitting at complementary wavelengths. InGaN p-i-n photodiodes operating at various regions of the visible spectrum tailored by the i-layer properties were developed. This was achieved by the novel approach of employing InxGa1-xN in all layers of the p-i-n photodiodes, enabling nearly

  20. Dielectric response of wurtzite gallium nitride in the terahertz frequency range

    Science.gov (United States)

    Hibberd, M. T.; Frey, V.; Spencer, B. F.; Mitchell, P. W.; Dawson, P.; Kappers, M. J.; Oliver, R. A.; Humphreys, C. J.; Graham, D. M.

    2016-12-01

    We report on the characterization of the intrinsic, anisotropic, dielectric properties of wurtzite gallium nitride in the spectral range of 0.5-11 THz, using terahertz time-domain spectroscopy. The ordinary (ε˜⊥) and extraordinary (ε˜∥) components of the complex dielectric function were determined experimentally for a semi-insulating, m-plane gallium nitride single crystal, providing measurements of the refractive indices (n⊥,∥) and absorption coefficients (α⊥,∥) . These material parameters were successfully modeled by considering the contribution of the optical phonon modes, measured using Raman spectroscopy, to the dielectric function, giving values for the relative static dielectric constants of ε0⊥ = 9.22 ± 0.02 and ε0∥ = 10.32 ± 0.03 for wurtzite gallium nitride.

  1. In vitro bio-functionality of gallium nitride sensors for radiation biophysics

    Energy Technology Data Exchange (ETDEWEB)

    Hofstetter, Markus [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany); Howgate, John [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany); Schmid, Martin [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany); Schoell, Sebastian; Sachsenhauser, Matthias [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany); Adiguezel, Denis [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany); Stutzmann, Martin; Sharp, Ian D. [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching (Germany); Thalhammer, Stefan, E-mail: stefan.thalhammer@helmholtz-muenchen.de [Helmholtz Zentrum Muenchen, German Research Center for Environmental Health, Ingolstaedter Landstrasse 1, D-85764 Neuherberg (Germany)

    2012-07-27

    Highlights: Black-Right-Pointing-Pointer Gallium nitride based sensors show promising characteristics to monitor cellular parameters. Black-Right-Pointing-Pointer Cell growth experiments reveal excellent biocompatibiltiy of the host GaN material. Black-Right-Pointing-Pointer We present a biofunctionality assay using ionizing radiation. Black-Right-Pointing-Pointer DNA repair is utilized to evaluate material induced alterations in the cellular behavior. Black-Right-Pointing-Pointer GaN shows no bio-functional influence on the cellular environment. -- Abstract: There is an increasing interest in the integration of hybrid bio-semiconductor systems for the non-invasive evaluation of physiological parameters. High quality gallium nitride and its alloys show promising characteristics to monitor cellular parameters. Nevertheless, such applications not only request appropriate sensing capabilities but also the biocompatibility and especially the biofunctionality of materials. Here we show extensive biocompatibility studies of gallium nitride and, for the first time, a biofunctionality assay using ionizing radiation. Analytical sensor devices are used in medical settings, as well as for cell- and tissue engineering. Within these fields, semiconductor devices have increasingly been applied for online biosensing on a cellular and tissue level. Integration of advanced materials such as gallium nitride into these systems has the potential to increase the range of applicability for a multitude of test devices and greatly enhance sensitivity and functionality. However, for such applications it is necessary to optimize cell-surface interactions and to verify the biocompatibility of the semiconductor. In this work, we present studies of mouse fibroblast cell activity grown on gallium nitride surfaces after applying external noxa. Cell-semiconductor hybrids were irradiated with X-rays at air kerma doses up to 250 mGy and the DNA repair dynamics, cell proliferation, and cell growth

  2. Thermal Cycling and High Temperature Reverse Bias Testing of Control and Irradiated Gallium Nitride Power Transistors

    Science.gov (United States)

    Patterson, Richard L.; Boomer, Kristen T.; Scheick, Leif; Lauenstein, Jean-Marie; Casey, Megan; Hammoud, Ahmad

    2014-01-01

    The power systems for use in NASA space missions must work reliably under harsh conditions including radiation, thermal cycling, and exposure to extreme temperatures. Gallium nitride semiconductors show great promise, but information pertaining to their performance is scarce. Gallium nitride N-channel enhancement-mode field effect transistors made by EPC Corporation in a 2nd generation of manufacturing were exposed to radiation followed by long-term thermal cycling and testing under high temperature reverse bias conditions in order to address their reliability for use in space missions. Result of the experimental work are presented and discussed.

  3. Investigation of phonon modes in gallium nitride nanowires deposited by thermal CVD

    Energy Technology Data Exchange (ETDEWEB)

    Rizal, Umesh, E-mail: umeshrizal680@gmail.com; Swain, Bibhu P., E-mail: bibhu.s@smit.smu.edu.in [Nano Processing Laboratory, Centre for Material Science and Nanotechnology, Sikkim Manipal Institute of Technology, Majitar, Rangpo, East Sikkim, India-737136 (India); Swain, Bhabani S., E-mail: bsswain@kookmin.ac.kr [School of Advanced Materials Engineering, Kookmin University, Sungbuk-gu, Jeongnung-dong, Seoul (Korea, Republic of)

    2016-04-13

    Gallium nitride nanowires (GaN-NWs) of diameters ranging from 20 to 80 nm were grown on the p-type Si substrate by Thermal Chemical Vapor Deposition (TCVD) using Iron (Fe) catalyst via VLS mechanism. Raman and FTIR spectra reveal the presence of broad transverse optic (TO) and longitudinal optic (LO) phonon peak spreads over 500-600 cm{sup −1} and 720 cm{sup −1} respectively. The detail deconvolution of integrated transverse and longitudinal phonon analysis reveals phonon confinement brought out by incorporation of hydrogen atom. The red shifts of TO and LO phonon peak position indicates nanosized effect. I{sub A1(LO)}/I{sub A1(TO)} increases from 0.073 to 1.0 and their respective fwhm{sub A1(LO)}/fwhm{sub A1(TO)} also increases from 0.71 to 1.31 with increasing H{sub 2} flow rate. E{sub 1}(LO) - E{sub 1}(TO) and A{sub 1}(LO) - A{sub 1}(TO) increases from 173.83 to 190.73 and 184.89 to 193.22 respectively. Apart from this usual TO and LO phonon, we have found Surface Optic (SO) phonon at 671 cm{sup −1} in FTIR spectra. The intensity of PL peak increases with increasing H{sub 2} dilution reveals efficient passivation of defect centre at surface of GaN-NWs.

  4. Electrical Activation Studies of Silicon Implanted Aluminum Gallium Nitride with High Aluminum Mole Fraction

    Science.gov (United States)

    2007-12-01

    important to minimize imperfections and defects as well as the amount of unwanted impurities. The most common bulk method is the Czochralski Method , in...demonstrates a method for producing highly conductive Si- implanted n-type aluminum gallium nitride (AlxGa1-xN) alloys, and represents a comprehensive...54 IV. Experimental Method ..................................................................................... 57 Sample

  5. An alternative approach to the growth of single crystal gallium nitride

    Science.gov (United States)

    Jonathan, Neville

    1993-06-01

    This project has been primarily concerned with investigating a new approach to the synthesis of epitaxial layers of high purity gallium nitride. The new approach involves the use of hydrazoic acid, HN3, a previously untried precursor as the source of active nitrogen. A new, all-stainless steel apparatus which is UHV compatible, has been constructed. It has been designed to allow growth studies to be made by the chemical beam epitaxy (CBE) technique or by low pressure metal organic vapour phase deposition (LPMOCVD) at pressures up to ca. 1 mbar. During the grant period, the apparatus has been constructed, tested, and modified. Experiments have been carried out which show that gallium nitride and aluminium nitride can be made from the reaction of hydrazoic acid with trimethyl gallium and trimethyl aluminium respectively, at a hot substrate surface. In-situ RHEED patterns and ex-situ Auger spectra and x-ray diffraction data have been obtained. Systematic studies aimed at producing high quality single crystal films have been made. The results are promising and uniform, golden yellow films of gallium nitride can now be produced. RHEED data show that the films are composed of highly orientated crystals. The x-ray results support this, with crystal sizes being at least 1000 A with the crystals strongly orientated along the c-axis.

  6. Systematic Study of p-type Doping and Related Defects in III-Nitrides: Pathway toward a Nitride HBT

    Science.gov (United States)

    2012-11-20

    indium and gallium and were between 0.24 and 0.3 × 10-7 Torr normalized BEP . InGaN was grown via MME using a shutter modulation scheme similar to...surface for subsequent growth.18, 20-23 The aluminum flux during the buffer layer growth was 6x10-7 Torr beam equivalent pressure ( BEP ), and the...Gallium was supplied by either a standard effusion cell or a Veeco SUMO® cell at a metal-rich flux of 6.5x10-7 to 7.5x10-7 Torr BEP . Gallium and

  7. Effect of variation of silicon nitride passivation layer on electron irradiated aluminum gallium nitride/gallium nitride HEMT structures

    Science.gov (United States)

    Jackson, Helen C.

    Silicon nitride passivation on AlGaNGaN heterojunction devices can improve performance by reducing electron traps at the surface. This research studies the effect of displacement damage caused by 1 MeV electron irradiation as a function of the variation of passivation layer thickness and heterostructure layer variation on AlGaN/GaN HEMTs. The effects of passivation layer thickness are investigated at thicknesses of 0, 20, 50 and 120 nanometers on AlGaNGaN test structures with either an AlN nucleation layer or a GaN cap structures which are then measured before and immediately after 1.0 MeV electron irradiation at fluences of 1016 cm-2. Hall system measurements are used to observe changes in mobility, carrier concentration and conductivity as a function of Si3N4 thickness. Models are developed that relate the device structure and passivation layer under 1 MeV radiation to the observed changes to the measured photoluminescence and deep level transient spectroscopy. A software model is developed to determine the production rate of defects from primary 1 MeV electrons that can be used for other energies and materials. The presence of either a 50 or 120 nm Si 3N4 passivation layer preserves the channel current for both and appears to be optimal for radiation hardness.

  8. Fabrication and characterization of gallium nitride electronic devices

    Science.gov (United States)

    Johnson, Jerry Wayne

    Gallium nitride (GaN)-based high electron mobility transistors (HEMTs), metal oxide semiconductor field effect transistors (MOSFETs), and Schottky rectifiers were fabricated and characterized. Novel dielectric materials Gd 2O3 and ScO were evaluated as potential gate dielectrics for GaN MOS applications. The devices presented herein show tremendous potential for elevated temperature, high frequency, and/or high voltage operation. AlGaN/GaN HEMTs were grown by MOCVD on sapphire and SiC substrates and by RF-MBE on sapphire substrates. Devices were fabricated with gate lengths from 100 nm to 1.2 mum. Drain current density approached 1 A/mm and extrinsic transconductance exceeded 200 mS/mm for small gate periphery devices. For the shortest gate length, a unity-gain cutoff frequency (fT) of 59 GHz and a maximum frequency of oscillation (fmax) of 90 GHz were extracted from measured scattering parameters. The experimental s-parameters were in excellent agreement with simulated results from small-signal linear modeling. Large signal characterization of 0.25 x 150 mum2 devices produced 2.75 W/mm at 3 GHz and 1.7 W/mm at 10 GHz. Devices fabricated on high thermal conductivity SiC substrates exhibited superior high temperature performance and a reduced density of threading dislocations. Novel gate dielectrics Gd2O3 and ScO were grown by gas source molecular beam epitaxy (GSMBE). Current-voltage (I-V) and capacitance-voltage (C-V) data were collected from MOS capacitors to evaluate the bulk and interfacial electrical properties of the insulators. Single crystal Gd2O 3 was demonstrated on GaN, but the resultant MOSFET exhibited a large gate leakage attributed to defects and dislocations in the oxide. MOSFETs with a stacked gate dielectric of Gd2O3/SiO2 were operational at a drain source bias of 80 V and a gate bias of +7 V. Bulk GaN templates grown by hydride vapor phase epitaxy (HYPE) were used to fabricate vertical geometry Schottky rectifiers. Size- and temperature

  9. Advanced W-Band Gallium Nitride Monolithic Microwave Integrated Circuits (MMICs) for Cloud Doppler Radar Supporting ACE Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Develop W-band Gallium Nitride (GaN) MMICs to enable the advanced cross-track scanning, dual-frequency Doppler cloud radar concept in support of the...

  10. Epitaxially-grown Gallium Nitride on Gallium Oxide substrate for photon pair generation in visible and telecomm wavelengths

    KAUST Repository

    Awan, Kashif M.

    2016-08-11

    Gallium Nitride (GaN), along with other III-Nitrides, is attractive for optoelectronic and electronic applications due to its wide direct energy bandgap, as well as high thermal stability. GaN is transparent over a wide wavelength range from infra-red to the visible band, which makes it suitable for lasers and LEDs. It is also expected to be a suitable candidate for integrated nonlinear photonic circuits for a wide range of applications from all-optical signal processing to quantum computing and on-chip wavelength conversion. Despite its abundant use in commercial devices, there is still need for suitable substrate materials to reduce high densities of threading dislocations (TDs) and other structural defects like stacking faults, and grain boundaries. All these defects degrade the optical quality of the epi-grown GaN layer as they act as non-radiative recombination centers.

  11. Optical and Micro-Structural Characterization of MBE Grown Indium Gallium Nitride Polar Quantum Dots

    KAUST Repository

    El Afandy, Rami

    2011-07-07

    Gallium nitride and related materials have ushered in scientific and technological breakthrough for lighting, mass data storage and high power electronic applications. These III-nitride materials have found their niche in blue light emitting diodes and blue laser diodes. Despite the current development, there are still technological problems that still impede the performance of such devices. Three-dimensional nanostructures are proposed to improve the electrical and thermal properties of III-nitride optical devices. This thesis consolidates the characterization results and unveils the unique physical properties of polar indium gallium nitride quantum dots grown by molecular beam epitaxy technique. In this thesis, a theoretical overview of the physical, structural and optical properties of polar III-nitrides quantum dots will be presented. Particular emphasis will be given to properties that distinguish truncated-pyramidal III-nitride quantum dots from other III-V semiconductor based quantum dots. The optical properties of indium gallium nitride quantum dots are mainly dominated by large polarization fields, as well as quantum confinement effects. Hence, the experimental investigations for such quantum dots require performing bandgap calculations taking into account the internal strain fields, polarization fields and confinement effects. The experiments conducted in this investigation involved the transmission electron microscopy and x-ray diffraction as well as photoluminescence spectroscopy. The analysis of the temperature dependence and excitation power dependence of the PL spectra sheds light on the carrier dynamics within the quantum dots, and its underlying wetting layer. A further analysis shows that indium gallium nitride quantum dots through three-dimensional confinements are able to prevent the electronic carriers from getting thermalized into defects which grants III-nitrides quantum dot based light emitting diodes superior thermally induced optical

  12. 0.15-micron Gallium Nitride (GaN) Microwave Integrated Circuit Designs Submitted to TriQuint Semiconductor for Fabrication

    Science.gov (United States)

    2012-09-01

    arsenide GaN gallium nitride LNA low-noise amplifier MMIC monolithic microwave integrated circuit PA power amplifier HEMT high electron mobility...0.15-µm Gallium Nitride ( GaN ) Microwave Integrated Circuit Designs Submitted to TriQuint Semiconductor for Fabrication by John Penn ARL...MD 20783-1197 ARL-TN-0496 September 2012 0.15-µm Gallium Nitride ( GaN ) Microwave Integrated Circuit Designs Submitted to TriQuint

  13. The electrical properties of photodiodes based on nanostructure gallium doped cadmium oxide/p-type silicon junctions

    Science.gov (United States)

    Çavaş, M.; Yakuphanoğlu, F.; Karataş, Ş.

    2017-01-01

    Gallium doped cadmium-oxide (CdO: Ga) thin films were successfully deposited by sol-gel spin coating method on p-type Si substrate. The electrical properties of the photodiode based on nanostructure Ga doped n-CdO/p-Si junctions were investigated. The current-voltage (I-V) characteristics of the structure were investigated under various light intensity and dark. It was observed that generated photocurrent of the Au/n-CdO/p-Si junctions depended on light intensity. The capacitance-voltage and conductance-voltage measurements were carried out for this diode in the frequency range between 100 and 1000 kHz at room temperature by steps of 100 kHz. The capacitance decreased with increasing frequency due to a continuous distribution of the interface states. These results suggested that the Au/n-CdO/p-Si Schottky junctions could be utilized as a photosensor. Furthermore, the voltage and frequency dependence of series resistance were calculated from the C-V and G/ω-V measurements and plotted as functions of voltage and frequency. The distribution profile of R S -V gave a peak in the depletion region at low frequencies and disappeared with increasing frequencies.

  14. Photocurrent enhancement of an individual gallium nitride nanowire decorated with gold nanoparticles

    Science.gov (United States)

    Sundararajan, Jency Pricilla; Sargent, Meredith; McIlroy, David N.

    2011-03-01

    Variation in electron transport properties of individual n-type gallium nitride (GaN) nanowire and gold decorated gallium nitride (Au-GaN) nanowire were studied with respect to laser exposure of different wavelength and intensity. Single nanowire devices were manufactured by photolithography process in nanotechnology cleanroom, were characterized by scanning electron microscope (SEM) and transmission electron microscope (TEM). A drop in electrical conductivity of Au-GaN nanowire was observed relative to bare GaN nanowire. Under laser illumination, we noticed an enhancement in photocurrent in Au-GaN nanowire, which increased with increase in excitation power at ambient conditions. We present a comparative study of the opto-electrical behavior of bare GaN nanowire vs Au-GaN nanowire and explain the IV characteristics and FET characteristics with respect to the length and diameter of nanowire. USDA, UI-BANTech.

  15. Novel approach for n-type doping of HVPE gallium nitride with germanium

    Science.gov (United States)

    Hofmann, Patrick; Krupinski, Martin; Habel, Frank; Leibiger, Gunnar; Weinert, Berndt; Eichler, Stefan; Mikolajick, Thomas

    2016-09-01

    We present a novel method for germanium doping of gallium nitride by in-situ chlorination of solid germanium during the hydride vapour phase epitaxy (HVPE) process. Solid germanium pieces were placed in the doping line with a hydrogen chloride flow directed over them. We deduce a chlorination reaction taking place at 800 ° C , which leads to germanium chloroform (GeHCl3) or germanium tetrachloride (GeCl4). The reactor shows a germanium rich residue after in-situ chlorination experiments, which can be removed by hydrogen chloride etching. All gallium nitride crystals exhibit n-type conductivity, which shows the validity of the in-situ chlorination of germanium for doping. A complex doping profile is found for each crystal, which was assigned to a combination of localised supply of the dopant and sample rotation during growth and switch-off effects of the HVPE reactor.

  16. The Effects of Thermal Cycling on Gallium Nitride and Silicon Carbide Semiconductor Devices for Aerospace Use

    Science.gov (United States)

    Patterson, Richard L.; Hammoud, Ahmad

    2012-01-01

    Electronics designed for use in NASA space missions are required to work efficiently and reliably under harsh environment conditions. These Include radiation, extreme temperatures, thermal cycling, to name a few. Preliminary data obtained on new Gallium Nitride and Silicon Carbide power devices under exposure to radiation followed by long term thermal cycling are presented. This work was done in collaboration with GSFC and JPL in support of the NASA Electronic Parts and Packaging (NEPP) Program

  17. Gallium Nitride (GaN) High Power Electronics (FY11)

    Science.gov (United States)

    2012-01-01

    for HPE GaN high electron mobility transistors ( HEMTs ) compared to SiC metal-oxide-semiconductor field effect transistors (MOSFETs). Although a few...Figure 16. Asymmetric rocking curve for an HVPE film grown on an HVPE substrate. ............19 Figure 17. Schematic of a GaN /AlGaN HEMT structure grown...frequency (RF) HEMTs . These considerable investments can be leveraged for GaN HPE. Some people are concerned about the relative scarcity of gallium

  18. Properties of Erbium and Ytterbium Doped Gallium Nitride Layers Fabricated by Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    V. Prajzler

    2006-01-01

    Full Text Available We report about some properties of erbium and erbium/ytterbium doped gallium nitride (GaN layers fabricated by magnetron sputtering onsilicon, quartz and Corning glass substrates. For fabricating GaN layers two types of targets were used - gallium in a stainless steel cup anda Ga2O3 target. Deposition was carried out in the Ar+N2 gas mixture. For erbium and ytterbium doping into GaN layers, erbium metallicpowder and ytterbium powder or Er2O3 and Yb2O3 pellets were laid on the top of the target. The samples were characterized by X-raydiffraction (XRD, photoluminescence spectra and nuclear analytical methods. While the use of a metallic gallium target ensured thedeposition of well-developed polycrystalline layers, the use of gallium oxide target provided GaN films with poorly developed crystals. Bothapproaches enabled doping with erbium and ytterbium ions during deposition, and typical emission at 1 530 nm due to the Er3+ intra-4f 4I13/2 → 4I15/2 transition was observed.

  19. Polarity Control and Doping in Aluminum Gallium Nitride

    Science.gov (United States)

    2013-06-01

    seems to go hand in hand with a decrease in resistivity. In other words, a more activated sample shows a more intense ABX transition as well as a...Al0.8Ga0.2N grown on c- oriented AlN single crystal substrates; Physica Status Solidi (c) 9 (3-4); 584-587 (2012). 5 Y. Taniyasu, M. Kasu and T. Makimoto ...emitting diodes; Nature 406 (6798); 865-868 (2000). 21 U. T. Schwarz and M. Kneissl; Nitride emitters go nonpolar; physica status solidi (RRL

  20. Outphasing Control of Gallium Nitride based Very High Frequency Resonant Converter

    DEFF Research Database (Denmark)

    Madsen, Mickey Pierre; Perreault, David J.; Knott, Arnold;

    2015-01-01

    . Then the modulation technique is described and the design equations given. Finally a design example is given for a converter consisting of two class E inverters with a lossless combiner and a common half bridge rectifier. It is shown how outphasing modulation can be used for line regulation while insuring equal...... and purely resistive loading of the inverters. Combined with a proper design of the inverters that, insures they can achieve zero voltage switching across a wide load range, and gallium nitride FETs for the switching devices, this makes it possible to achieve more than 90% efficiency across most of the input...

  1. Near-infrared characterization of gallium nitride photonic-crystal waveguides and cavities.

    Science.gov (United States)

    Dharanipathy, U; Vico Triviño, N; Yan, C; Diao, Z; Carlin, J-F; Grandjean, N; Houdré, R

    2012-11-15

    We report the design and optical characterization of fully suspended wire waveguides and photonic crystal (PhC) membranes fabricated on a gallium nitride layer grown on silicon substrate operating at 1.5 μm. W1-type PhC waveguides are coupled with suspended wires and are investigated using a standard end-fire setup. The experimental and theoretical dispersion properties of the propagating modes in the wires and photonic-crystal waveguides are shown. Modified L3 cavities with quality factors of up to 2200 and heterostructure cavities with quality factors of up to 5400 are experimentally demonstrated.

  2. Optical polarization based logic functions (XOR or XNOR) with nonlinear Gallium nitride nanoslab.

    Science.gov (United States)

    Bovino, F A; Larciprete, M C; Giardina, M; Belardini, A; Centini, M; Sibilia, C; Bertolotti, M; Passaseo, A; Tasco, V

    2009-10-26

    We present a scheme of XOR/XNOR logic gate, based on non phase-matched noncollinear second harmonic generation from a medium of suitable crystalline symmetry, Gallium nitride. The polarization of the noncollinear generated beam is a function of the polarization of both pump beams, thus we experimentally investigated all possible polarization combinations, evidencing that only some of them are allowed and that the nonlinear interaction of optical signals behaves as a polarization based XOR. The experimental results show the peculiarity of the nonlinear optical response associated with noncollinear excitation, and are explained using the expression for the effective second order optical nonlinearity in noncollinear scheme.

  3. Effects of Radiation and Long-Term Thermal Cycling on EPC 1001 Gallium Nitride Transistors

    Science.gov (United States)

    Patterson, Richard L.; Scheick, Leif; Lauenstein, Jean-Marie; Casey, Megan; Hammoud, Ahmad

    2012-01-01

    Electronics designed for use in NASA space missions are required to work efficiently and reliably under harsh environment conditions. These include radiation, extreme temperatures, and thermal cycling, to name a few. Data obtained on long-term thermal cycling of new un-irradiated and irradiated samples of EPC1001 gallium nitride enhancement-mode transistors are presented. This work was done by a collaborative effort including GRC, GSFC, and support the NASA www.nasa.gov 1 JPL in of Electronic Parts and Packaging (NEPP) Program

  4. Size and Shape Dependence on Melting Temperature of Gallium Nitride Nanoparticles

    Directory of Open Access Journals (Sweden)

    Paneerselvam Antoniammal

    2012-01-01

    Full Text Available The study of variation of the size and shape effect on the melting property of gallium nitride nanoparticles with their spherical and cylindrical geometrical feature is theoretically explored. A numerical thermodynamical model has been devoted for the study. A comparative investigation is made between the two shapes, at the range of ~3 nm dia. The cylindrical GaN nanoparticles, whose melting point has been reported to decrease with decreasing particle radius, become larger than spherical-shaped nanoparticles. The melting temperature obtained in the present study is in line with the function of radius of curvature.

  5. Advanced Epi Tools for Gallium Nitride Light Emitting Diode Devices

    Energy Technology Data Exchange (ETDEWEB)

    Patibandla, Nag; Agrawal, Vivek

    2012-12-01

    Over the course of this program, Applied Materials, Inc., with generous support from the United States Department of Energy, developed a world-class three chamber III-Nitride epi cluster tool for low-cost, high volume GaN growth for the solid state lighting industry. One of the major achievements of the program was to design, build, and demonstrate the world’s largest wafer capacity HVPE chamber suitable for repeatable high volume III-Nitride template and device manufacturing. Applied Materials’ experience in developing deposition chambers for the silicon chip industry over many decades resulted in many orders of magnitude reductions in the price of transistors. That experience and understanding was used in developing this GaN epi deposition tool. The multi-chamber approach, which continues to be unique in the ability of the each chamber to deposit a section of the full device structure, unlike other cluster tools, allows for extreme flexibility in the manufacturing process. This robust architecture is suitable for not just the LED industry, but GaN power devices as well, both horizontal and vertical designs. The new HVPE technology developed allows GaN to be grown at a rate unheard of with MOCVD, up to 20x the typical MOCVD rates of 3{micro}m per hour, with bulk crystal quality better than the highest-quality commercial GaN films grown by MOCVD at a much cheaper overall cost. This is a unique development as the HVPE process has been known for decades, but never successfully commercially developed for high volume manufacturing. This research shows the potential of the first commercial-grade HVPE chamber, an elusive goal for III-V researchers and those wanting to capitalize on the promise of HVPE. Additionally, in the course of this program, Applied Materials built two MOCVD chambers, in addition to the HVPE chamber, and a robot that moves wafers between them. The MOCVD chambers demonstrated industry-leading wavelength yield for GaN based LED wafers and industry

  6. Gallium nitride nanowire based nanogenerators and light-emitting diodes.

    Science.gov (United States)

    Chen, Chih-Yen; Zhu, Guang; Hu, Youfan; Yu, Jeng-Wei; Song, Jinghui; Cheng, Kai-Yuan; Peng, Lung-Han; Chou, Li-Jen; Wang, Zhong Lin

    2012-06-26

    Single-crystal n-type GaN nanowires have been grown epitaxially on a Mg-doped p-type GaN substrate. Piezoelectric nanognerators based on GaN nanowires are investigated by conductive AFM, and the results showed an output power density of nearly 12.5 mW/m(2). Luminous LED modules based on n-GaN nanowires/p-GaN substrate have been fabricated. CCD images of the lighted LED and the corresponding electroluminescence spectra are recorded at a forward bias. Moreover, the GaN nanowire LED can be lighted up by the power provided by a ZnO nanowire based nanogenerator, demonstrating a self-powered LED using wurtzite-structured nanomaterials.

  7. High-fluence hyperthermal ion irradiation of gallium nitride surfaces at elevated temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Finzel, A.; Gerlach, J.W., E-mail: juergen.gerlach@iom-leipzig.de; Lorbeer, J.; Frost, F.; Rauschenbach, B.

    2014-10-30

    Highlights: • Irradiation of gallium nitride films with hyperthermal nitrogen ions. • Surface roughening at elevated sample temperatures was observed. • No thermal decomposition of gallium nitride films during irradiation. • Asymmetric surface diffusion processes cause local roughening. - Abstract: Wurtzitic GaN films deposited on 6H-SiC(0001) substrates by ion-beam assisted molecular-beam epitaxy were irradiated with hyperthermal nitrogen ions with different fluences at different substrate temperatures. In situ observations with reflection high energy electron diffraction showed that during the irradiation process the surface structure of the GaN films changed from two dimensional to three dimensional at elevated temperatures, but not at room temperature. Atomic force microscopy revealed an enhancement of nanometric holes and canyons upon the ion irradiation at higher temperatures. The roughness of the irradiated and heated GaN films was clearly increased by the ion irradiation in accordance with x-ray reflectivity measurements. A sole thermal decomposition of the films at the chosen temperatures could be excluded. The results are discussed taking into account temperature dependent sputtering and surface uphill adatom diffusion as a function of temperature.

  8. Improved heat dissipation in gallium nitride light-emitting diodes with embedded graphene oxide pattern.

    Science.gov (United States)

    Han, Nam; Cuong, Tran Viet; Han, Min; Ryu, Beo Deul; Chandramohan, S; Park, Jong Bae; Kang, Ji Hye; Park, Young-Jae; Ko, Kang Bok; Kim, Hee Yun; Kim, Hyun Kyu; Ryu, Jae Hyoung; Katharria, Y S; Choi, Chel-Jong; Hong, Chang-Hee

    2013-01-01

    The future of solid-state lighting relies on how the performance parameters will be improved further for developing high-brightness light-emitting diodes. Eventually, heat removal is becoming a crucial issue because the requirement of high brightness necessitates high-operating current densities that would trigger more joule heating. Here we demonstrate that the embedded graphene oxide in a gallium nitride light-emitting diode alleviates the self-heating issues by virtue of its heat-spreading ability and reducing the thermal boundary resistance. The fabrication process involves the generation of scalable graphene oxide microscale patterns on a sapphire substrate, followed by its thermal reduction and epitaxial lateral overgrowth of gallium nitride in a metal-organic chemical vapour deposition system under one-step process. The device with embedded graphene oxide outperforms its conventional counterpart by emitting bright light with relatively low-junction temperature and thermal resistance. This facile strategy may enable integration of large-scale graphene into practical devices for effective heat removal.

  9. Distinctive signature of indium gallium nitride quantum dot lasing in microdisk cavities.

    Science.gov (United States)

    Woolf, Alexander; Puchtler, Tim; Aharonovich, Igor; Zhu, Tongtong; Niu, Nan; Wang, Danqing; Oliver, Rachel; Hu, Evelyn L

    2014-09-30

    Low-threshold lasers realized within compact, high-quality optical cavities enable a variety of nanophotonics applications. Gallium nitride materials containing indium gallium nitride (InGaN) quantum dots and quantum wells offer an outstanding platform to study light-matter interactions and realize practical devices such as efficient light-emitting diodes and nanolasers. Despite progress in the growth and characterization of InGaN quantum dots, their advantages as the gain medium in low-threshold lasers have not been clearly demonstrated. This work seeks to better understand the reasons for these limitations by focusing on the simpler, limited-mode microdisk cavities, and by carrying out comparisons of lasing dynamics in those cavities using varying gain media including InGaN quantum wells, fragmented quantum wells, and a combination of fragmented quantum wells with quantum dots. For each gain medium, we use the distinctive, high-quality (Q ∼ 5,500) modes of the cavities, and the change in the highest-intensity mode as a function of pump power to better understand the dominant radiative processes. The variations of threshold power and lasing wavelength as a function of gain medium help us identify the possible limitations to lower-threshold lasing with quantum dot active medium. In addition, we have identified a distinctive lasing signature for quantum dot materials, which consistently lase at wavelengths shorter than the peak of the room temperature gain emission. These findings not only provide better understanding of lasing in nitride-based quantum dot cavity systems but also shed insight into the more fundamental issues of light-matter coupling in such systems.

  10. Advanced processing of gallium nitride for novel electronic devices

    Science.gov (United States)

    Cao, Xian-An

    2000-10-01

    The 1990s have brought commercial viability of GaN-based photonic devices and startling progress of GaN-based field effect transistors. However, continued research is required to explore the full potential offered by the III-V nitride system, especially for microelectronic applications and power switches. Further improvement of fabrication procedures is one of high priorities of current research. A host of processing challenges are presented by GaN and related materials because of their wide-bandgap nature and chemical stability. A complete understanding in the critical areas such as ion implantation doping and isolation, rapid thermal annealing, metal contact, and dry etching process, is necessary to improve the routine device reproducibility, and should directly lead to optimization of device performance. This dissertation has focused on understanding and optimization of several key aspects of GaN device processing. A novel rapid thermal processing up to 1500°C, in conjunction with AlN encapsulation, has been developed. The activation processes of implanted Si or Group VI donors, and common acceptors in GaN by using this ultrahigh temperature annealing, along with its effects on surface degradation, dopant redistribution and damage removal have been examined. 1400°C has proven to be the optimum temperature to achieve high activation efficiency and to repair the ion-induced lattice defects. Ion implantation was also employed to create high resistivity GaN. Damage-related isolation with sheet resistances of 1012 O/□ in n-GaN and 1010 O/□ in p-GaN has been achieved by implant of O and transition metal elements. Effects of surface cleanliness on characteristics of GaN Schottky contacts have been investigated, and the reduction in barrier height was correlated with removing the native oxide that forms an insulating layer on the conventionally-cleaned surface. W alloys have been deposited on Si-implanted samples and Mg-doped epilayers to achieve ohmic contacts

  11. Imaging the p-n junction in a gallium nitride nanowire with a scanning microwave microscope

    Energy Technology Data Exchange (ETDEWEB)

    Imtiaz, Atif [Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States); Department of Electrical, Computer, and Energy Engineering, University of Colorado, Boulder, Colorado 80309 (United States); Wallis, Thomas M.; Brubaker, Matt D.; Blanchard, Paul T.; Bertness, Kris A.; Sanford, Norman A.; Kabos, Pavel, E-mail: kabos@boulder.nist.gov [Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States); Weber, Joel C. [Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States); Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309 (United States); Coakley, Kevin J. [Information Technology Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305 (United States)

    2014-06-30

    We used a broadband, atomic-force-microscope-based, scanning microwave microscope (SMM) to probe the axial dependence of the charge depletion in a p-n junction within a gallium nitride nanowire (NW). SMM enables the visualization of the p-n junction location without the need to make patterned electrical contacts to the NW. Spatially resolved measurements of S{sub 11}{sup ′}, which is the derivative of the RF reflection coefficient S{sub 11} with respect to voltage, varied strongly when probing axially along the NW and across the p-n junction. The axial variation in S{sub 11}{sup ′}  effectively mapped the asymmetric depletion arising from the doping concentrations on either side of the junction. Furthermore, variation of the probe tip voltage altered the apparent extent of features associated with the p-n junction in S{sub 11}{sup ′} images.

  12. Positive focal shift of gallium nitride high contrast grating focusing reflectors

    Science.gov (United States)

    He, Shumin; Wang, Zhenhai; Liu, Qifa

    2016-09-01

    We design a type of metasurfaces capable of serving as a visible-light focusing reflector based on gallium nitride (GaN) high contrast gratings (HCGs). The wavefront of the reflected light is precisely manipulated by spatial variation of the grating periods along the subwavelength ridge array to achieve light focusing. Different from conventional negative focal shift effect, a positive focal shift is observed in such focusing reflectors. Detailed investigations of the influence of device size on the focusing performance, especially the focal length, are preformed via a finite element method . The results show that all performance parameters are greatly affected by the reflector size. A more concentrated focal point, or a better focusing capability, can be achieved by larger size. With increasing reflector size, the achieved focal length decreases and gradually approaches to the design, thus the corresponding positive focal shift decreases. Our results are helpful for understanding the visible-light control of the planar HCG-based focusing reflectors.

  13. Shell Model for Elastic and Thermodynamic Properties of Gallium Nitride with Hexagonal Wurtzite Structure

    Institute of Scientific and Technical Information of China (English)

    CHENG Yan; TU Ya-Jing; ZENG Zhao-Yi; GOU Qing-Quan

    2008-01-01

    Shell model molecular dynamic simulation with interatomic pair potential is utilized to investigate the elastic and thermodynamic properties of gallium nitride with hexagonal wurtzite structure (w-GaN) at high pressure. The calculated elastic constants Cij at zero pressure and 300 K agree well with the experimental data and other calculated values. Meanwhile, the dependences of the relative volume V/Vo, elastic constants Cij, entropy S, enthalpy H, and heat capacities Cv and Cp on pressure are successfully obtained. From the elastic constants obtained, we also calculate the shear modulus G, bulk modulus B, Young's modulus E, Poisson's ratio v, Debye temperature ΘD, and shear anisotropic factor Ashear on pressures.

  14. Gallium nitride is biocompatible and non-toxic before and after functionalization with peptides.

    Science.gov (United States)

    Jewett, Scott A; Makowski, Matthew S; Andrews, Benjamin; Manfra, Michael J; Ivanisevic, Albena

    2012-02-01

    The toxicity of semiconductor materials can significantly hinder their use for in vitro and in vivo applications. Gallium nitride (GaN) is a material with remarkable properties, including excellent chemical stability. This work demonstrated that functionalized and etched GaN surfaces were stable in aqueous environments and leached a negligible amount of Ga in solution even in the presence of hydrogen peroxide. Also, GaN surfaces in cell culture did not interfere with nearby cell growth, and etched GaN promoted the adhesion of cells compared to etched silicon surfaces. A model peptide, "IKVAV", covalently attached to GaN and silicon surfaces increased the adhesion of PC12 cells. Peptide terminated GaN promoted greater cell spreading and extension of neurites. The results suggest that peptide modified GaN is a biocompatible and non-toxic material that can be used to probe chemical and electrical stimuli associated with neural interfaces.

  15. Radiation and Thermal Cycling Effects on EPC1001 Gallium Nitride Power Transistors

    Science.gov (United States)

    Patterson, Richard L.; Scheick, Leif Z.; Lauenstein, Jean M.; Casey, Megan C.; Hammoud, Ahmad

    2012-01-01

    Electronics designed for use in NASA space missions are required to work efficiently and reliably under harsh environment conditions. These include radiation, extreme temperatures, and thermal cycling, to name a few. Information pertaining to performance of electronic parts and systems under hostile environments is very scarce, especially for new devices. Such data is very critical so that proper design is implemented in order to ensure mission success and to mitigate risks associated with exposure of on-board systems to the operational environment. In this work, newly-developed enhancement-mode field effect transistors (FET) based on gallium nitride (GaN) technology were exposed to various particles of ionizing radiation and to long-term thermal cycling over a wide temperature range. Data obtained on control (un-irradiated) and irradiated samples of these power transistors are presented and the results are discussed.

  16. Thin Film Formation of Gallium Nitride Using Plasma-Sputter Deposition Technique

    Directory of Open Access Journals (Sweden)

    R. Flauta

    2003-06-01

    Full Text Available The formation of gallium nitride (GaN thin film using plasma-sputter deposition technique has beenconfirmed. The GaN film deposited on a glass substrate at an optimum plasma condition has shown x-raydiffraction (XRD peaks at angles corresponding to that of (002 and (101 reflections of GaN. The remainingmaterial on the sputtering target exhibited XRD reflections corresponding to that of bulk GaN powder. Toimprove the system’s base pressure, a new UHV compatible system is being developed to minimize theimpurities in residual gases during deposition. The sputtering target configuration was altered to allow themonitoring of target temperature using a molybdenum (Mo holder, which is more stable against Gaamalgam formation than stainless steel.

  17. Free-Standing Self-Assemblies of Gallium Nitride Nanoparticles: A Review

    Directory of Open Access Journals (Sweden)

    Yucheng Lan

    2016-08-01

    Full Text Available Gallium nitride (GaN is an III-V semiconductor with a direct band-gap of 3 . 4 e V . GaN has important potentials in white light-emitting diodes, blue lasers, and field effect transistors because of its super thermal stability and excellent optical properties, playing main roles in future lighting to reduce energy cost and sensors to resist radiations. GaN nanomaterials inherit bulk properties of the compound while possess novel photoelectric properties of nanomaterials. The review focuses on self-assemblies of GaN nanoparticles without templates, growth mechanisms of self-assemblies, and potential applications of the assembled nanostructures on renewable energy.

  18. Effects of transverse mode coupling and optical confinement factor on gallium-nitride based laser diode

    Institute of Scientific and Technical Information of China (English)

    Jin Xiao-Ming; Zhang Bei; Dai Tao; Zhang Guo-Yi

    2008-01-01

    We have investigated the transverse mode pattern and the optical field confinement factor of gallium nitride (GaN) laser diodes (LDs) theoretically. For the particular LD structure, composed of approximate 4μm thick n-GaN substrate layer, the maximum optical confinement factor was found to be corresponding to the 5th order transverse mode, the so-called lasing mode. Moreover, the value of the maximum confinement factor varies periodically when increasing the n-side GaN layer thickness, which simultaneously changes and increases the oscillation mode order of the GaN LD caused by the effects of mode coupling. The effects of the thickness and the average composition of Al in the AlGaN/GaN superlattice on the optical confinement factor are also presented. Finally, the mode coupling and optimization of the layers in the GaN-based LD are discussed.

  19. A review of gallium nitride LEDs for multi-gigabit-per-second visible light data communications

    Science.gov (United States)

    Rajbhandari, Sujan; McKendry, Jonathan J. D.; Herrnsdorf, Johannes; Chun, Hyunchae; Faulkner, Grahame; Haas, Harald; Watson, Ian M.; O'Brien, Dominic; Dawson, Martin D.

    2017-02-01

    The field of visible light communications (VLC) has gained significant interest over the last decade, in both fibre and free-space embodiments. In fibre systems, the availability of low cost polymer optical fibre (POF) that is compatible with visible data communications has been a key enabler. In free-space applications, the availability of hundreds of THz of the unregulated spectrum makes VLC attractive for wireless communications. This paper provides an overview of the recent developments in VLC systems based on gallium nitride (GaN) light-emitting diodes (LEDs), covering aspects from sources to systems. The state-of-the-art technology enabling bandwidth of GaN LEDs in the range of >400 MHz is explored. Furthermore, advances in key technologies, including advanced modulation, equalisation, and multiplexing that have enabled free-space VLC data rates beyond 10 Gb s-1 are also outlined.

  20. Localized surface plasmon resonances in gold nano-patches on a gallium nitride substrate.

    Science.gov (United States)

    D'Antonio, Palma; Inchingolo, Alessio Vincenzo; Perna, Giuseppe; Capozzi, Vito; Stomeo, Tiziana; De Vittorio, Massimo; Magno, Giovanni; Grande, Marco; Petruzzelli, Vincenzo; D'Orazio, Antonella

    2012-11-16

    In this paper we describe the design, fabrication and characterization of gold nano-patches, deposited on gallium nitride substrate, acting as optical nanoantennas able to efficiently localize the electric field at the metal-dielectric interface. We analyse the performance of the proposed device, evaluating the transmission and the electric field localization by means of a three-dimensional finite difference time domain (FDTD) method. We detail the fabrication protocol and show the morphological characterization. We also investigate the near-field optical transmission by means of scanning near-field optical microscope measurements, which reveal the excitation of a localized surface plasmon resonance at a wavelength of 633 nm, as expected by the FDTD calculations. Such results highlight how the final device can pave the way for the realization of a single optical platform where the active material and the metal nanostructures are integrated together on the same chip.

  1. Gallium Nitride Nanowires and Heterostructures: Toward Color-Tunable and White-Light Sources.

    Science.gov (United States)

    Kuykendall, Tevye R; Schwartzberg, Adam M; Aloni, Shaul

    2015-10-14

    Gallium-nitride-based light-emitting diodes have enabled the commercialization of efficient solid-state lighting devices. Nonplanar nanomaterial architectures, such as nanowires and nanowire-based heterostructures, have the potential to significantly improve the performance of light-emitting devices through defect reduction, strain relaxation, and increased junction area. In addition, relaxation of internal strain caused by indium incorporation will facilitate pushing the emission wavelength into the red. This could eliminate inefficient phosphor conversion and enable color-tunable emission or white-light emission by combining blue, green, and red sources. Utilizing the waveguiding modes of the individual nanowires will further enhance light emission, and the properties of photonic structures formed by nanowire arrays can be implemented to improve light extraction. Recent advances in synthetic methods leading to better control over GaN and InGaN nanowire synthesis are described along with new concept devices leading to efficient white-light emission.

  2. Carrier profiling in Si-implanted gallium nitride by Scanning Capacitance Microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Lamhamdi, M., E-mail: mohamed.lamhamdi@gmail.com [Universite Francois Rabelais de Tours, Laboratoire de Microelectronique de Puissance, 16 Rue Pierre et Marie Curie, BP 7155, 37071 Tours Cedex 2 (France); Cayrel, F. [Universite Francois Rabelais de Tours, Laboratoire de Microelectronique de Puissance, 16 Rue Pierre et Marie Curie, BP 7155, 37071 Tours Cedex 2 (France); Bazin, A.E. [Universite Francois Rabelais de Tours, Laboratoire de Microelectronique de Puissance, 16 Rue Pierre et Marie Curie, BP 7155, 37071 Tours Cedex 2 (France); STMicroelectronics, 16 Rue Pierre et Marie Curie, BP 7155, 37071 Tours Cedex 2 (France); Collard, E. [STMicroelectronics, 16 Rue Pierre et Marie Curie, BP 7155, 37071 Tours Cedex 2 (France); Alquier, D. [Universite Francois Rabelais de Tours, Laboratoire de Microelectronique de Puissance, 16 Rue Pierre et Marie Curie, BP 7155, 37071 Tours Cedex 2 (France)

    2012-03-15

    To face silicon limits, gallium nitride (GaN) exhibits major interests for optoelectronics and power electronic devices. Nevertheless, several challenges have to be overcome, with local doping by ion implantation as a major one. It requires development of reliable characterization tools able to provide electrical information with nanoscale resolution. In this work, Atomic Force Microscopy (AFM) combined to its Scanning Capacitance Microscopy (SCM) mode was used for surface damages quantification and nanoscale dopant profiling. GaN samples have been implanted with Si in order to obtain a box-like profile and annealed above 1000 Degree-Sign C under nitrogen with AlN protective cap layer. SCM measurements have led to reliable and quantitative dopant electrical activity measurements thank to calibration sample. Moreover, a good agreement, in terms of depth and shape, has been obtained between SCM and SIMS profiles. This work has evidenced that a high activation rate of implanted Si can be achieved using rapid thermal annealing.

  3. Gallium nitride based thin films for photon and particle radiation dosimetry

    Energy Technology Data Exchange (ETDEWEB)

    Hofstetter, Markus

    2012-07-23

    Ionization chambers have been used since the beginning of the 20th century for measuring ionizing radiation and still represent the ''gold standard'' in dosimetry. However, since the sensitivity of the devices is proportional to the detection volume, ionization chambers are not common in numerous medical applications, such as imaging. In these fields, spatially resolved dose information is, beside film-systems, usually measured with scintillators and photo-multipliers, which is a relatively complex and expensive technique. For thus much effort has been focused on the development of novel detection systems in the last decades and especially in the last few years. Examples include germanium or silicon photoconductive detectors, MOSFETs, and PIN-diodes. Although for these systems, miniaturization for spatially resolved detection is possible, they suffer from a range of disadvantages. Characteristics such as poor measurement stability, material degradation, and/or a limited measurement range prevent routine application of these techniques in medical diagnostic devices. This work presents the development and evaluation of gallium nitride (GaN) thin films and heterostructures to validate their application in x-ray detection in the medical regime. Furthermore, the impact of particle radiation on device response was investigated. Although previous publications revealed relatively low energy absorption of GaN, it is possible to achieve very high signal amplification factors inside the material due to an appropriate sensor configuration, which, in turn, compensates the low energy absorption. Thus, gallium nitride can be used as a photo-conductor with ohmic contacts. The conductive volume of the sensor changes in the presence of external radiation, which results in an amplified measurement signal after applying a bias voltage to the device. Experiments revealed a sensitivity of the device between air kerma rates of 1 {mu}Gy/s and 20 mGy/s. In this range

  4. Chemical exfoliation and optical characterization of threading-dislocation-free gallium-nitride ultrathin nanomembranes

    KAUST Repository

    Elafandy, Rami T.

    2014-11-13

    Semiconductor nanostructures have generated tremendous scientific interests as well as practical applications stemming from the engineering of low dimensional physics phenomena. Unlike 0D and 1D nanostructures, such as quantum dots and nanowires, respectively, 2D structures, such as nanomembranes, are unrivalled in their scalability for high yield manufacture and are less challenging in handling with the current transfer techniques. Furthermore, due to their planar geometry, nanomembranes are compatible with the current complementary metal oxide semiconductor (CMOS) technology. Due to these superior characteristics, there are currently different techniques in exfoliating nanomembranes with different crystallinities, thicknesses and compositions. In this work we demonstrate a new facile technique of exfoliating gallium nitride (GaN) nanomembranes with novel features, namely with the non-radiative cores of their threading-dislocations (TDs) being etched away. The exfoliation process is based on engineering the gallium vacancy (VGa) density during the GaN epitaxial growth with subsequent preferential etching. Based on scanning and transmission electron microscopies, as well as micro-photoluminescence measurements, a model is proposed to uncover the physical processes underlying the formation of the nanomembranes. Raman measurements are also performed to reveal the internal strain within the nanomembranes. After transferring these freely suspended 25 nm thin GaN nanomembranes to other substrates, we demonstrate the temperature dependence of their bandgap by photoluminescence technique, in order to shed light on the internal carrier dynamics. © (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

  5. Chemical exfoliation and optical characterization of threading-dislocation-free gallium-nitride ultrathin nanomembranes

    Science.gov (United States)

    ElAfandy, Rami T.; Majid, Mohammed A.; Ng, Tien Khee; Zhao, Lan; Cha, Dongkyu; Ooi, Boon S.

    2014-11-01

    Semiconductor nanostructures have generated tremendous scientific interests as well as practical applications stemming from the engineering of low dimensional physics phenomena. Unlike 0D and 1D nanostructures, such as quantum dots and nanowires, respectively, 2D structures, such as nanomembranes, are unrivalled in their scalability for high yield manufacture and are less challenging in handling with the current transfer techniques. Furthermore, due to their planar geometry, nanomembranes are compatible with the current complementary metal oxide semiconductor (CMOS) technology. Due to these superior characteristics, there are currently different techniques in exfoliating nanomembranes with different crystallinities, thicknesses and compositions. In this work we demonstrate a new facile technique of exfoliating gallium nitride (GaN) nanomembranes with novel features, namely with the non-radiative cores of their threading-dislocations (TDs) being etched away. The exfoliation process is based on engineering the gallium vacancy (VGa) density during the GaN epitaxial growth with subsequent preferential etching. Based on scanning and transmission electron microscopies, as well as micro-photoluminescence measurements, a model is proposed to uncover the physical processes underlying the formation of the nanomembranes. Raman measurements are also performed to reveal the internal strain within the nanomembranes. After transferring these freely suspended 25 nm thin GaN nanomembranes to other substrates, we demonstrate the temperature dependence of their bandgap by photoluminescence technique, in order to shed light on the internal carrier dynamics.

  6. A hybrid density functional view of native vacancies in gallium nitride.

    Science.gov (United States)

    Gillen, Roland; Robertson, John

    2013-10-09

    We investigated the transition energy levels of the vacancy defects in gallium nitride by means of a hybrid density functional theory approach (DFT). We show that, in contrast to predictions from a recent study on the level of purely local DFT, the inclusion of screened exchange stabilizes the triply positive charge state of the nitrogen vacancy for Fermi energies close to the valence band. On the other hand, the defect levels associated with the negative charge states of the nitrogen vacancy hybridize with the conduction band and turn out to be energetically unfavorable, except for high n-doping. For the gallium vacancy, the increased magnetic splitting between up-spin and down-spin bands due to stronger exchange interactions in sX-LDA pushes the defect levels deeper into the band gap and significantly increases the associated charge transition levels. Based on these results, we propose the ϵ(0| - 1) transition level as an alternative candidate for the yellow luminescence in GaN.

  7. Magnetic properties of gadolinium and carbon co-doped gallium nitride

    Science.gov (United States)

    Syed Kaleemullah, N.; Ramsubramanian, S.; Mohankumar, R.; Munawar Basha, S.; Rajagopalan, M.; Kumar, J.

    2017-01-01

    Investigations have been carried out to study the ferromagnetic properties of Gadolinium (Gd) Carbon (C) co-doped wurtzite Gallium Nitride (GaN) using full-potential linear augmented plane wave (FP-LAPW) method within the density functional theory. The system shows half-metallic nature when single Gd is substituted in Ga36N36 supercell. The presence of carbon in GaN supercell is found to generate weak magnetic moment (Ms) in the neighbouring atoms. When Carbon is codoped in the Gd-GaN, it increased the total magnetic moment of the system (Mtot). The cause of ferromagnetism in the Gd and C co-doped GaN has been explained by Zener's p-d exchange mechanism. The role of defects in the magnetic property of this system is also investigated. The results indicate the gallium vacancy influences the magnetic moment of the Gd and C codoped GaN more than the nitrogen vacancy. The presence of holes is effective than electrons in achieving the ferromagnetism in the considered system.

  8. Bright Room-Temperature Single Photon Emission from Defects in Gallium Nitride

    CERN Document Server

    Berhane, Amanuel M; Bodrog, Zoltán; Fiedler, Saskia; Schröder, Tim; Triviño, Noelia Vico; Palacios, Tomás; Gali, Adam; Toth, Milos; Englund, Dirk; Aharonovich, Igor

    2016-01-01

    Single photon emitters play a central role in many photonic quantum technologies. A promising class of single photon emitters consists of atomic color centers in wide-bandgap crystals, such as diamond silicon carbide and hexagonal boron nitride. However, it is currently not possible to grow these materials as sub-micron thick films on low-refractive index substrates, which is necessary for mature photonic integrated circuit technologies. Hence, there is great interest in identifying quantum emitters in technologically mature semiconductors that are compatible with suitable heteroepitaxies. Here, we demonstrate robust single photon emitters based on defects in gallium nitride (GaN), the most established and well understood semiconductor that can emit light over the entire visible spectrum. We show that the emitters have excellent photophysical properties including a brightness in excess of 500x10^3 counts/s. We further show that the emitters can be found in a variety of GaN wafers, thus offering reliable and s...

  9. Thermo-piezo-electro-mechanical simulation of AlGaN (aluminum gallium nitride) / GaN (gallium nitride) High Electron Mobility Transistors

    Science.gov (United States)

    Stevens, Lorin E.

    Due to the current public demand of faster, more powerful, and more reliable electronic devices, research is prolific these days in the area of high electron mobility transistor (HEMT) devices. This is because of their usefulness in RF (radio frequency) and microwave power amplifier applications including microwave vacuum tubes, cellular and personal communications services, and widespread broadband access. Although electrical transistor research has been ongoing since its inception in 1947, the transistor itself continues to evolve and improve much in part because of the many driven researchers and scientists throughout the world who are pushing the limits of what modern electronic devices can do. The purpose of the research outlined in this paper was to better understand the mechanical stresses and strains that are present in a hybrid AlGaN (Aluminum Gallium Nitride) / GaN (Gallium Nitride) HEMT, while under electrically-active conditions. One of the main issues currently being researched in these devices is their reliability, or their consistent ability to function properly, when subjected to high-power conditions. The researchers of this mechanical study have performed a static (i.e. frequency-independent) reliability analysis using powerful multiphysics computer modeling/simulation to get a better idea of what can cause failure in these devices. Because HEMT transistors are so small (micro/nano-sized), obtaining experimental measurements of stresses and strains during the active operation of these devices is extremely challenging. Physical mechanisms that cause stress/strain in these structures include thermo-structural phenomena due to mismatch in both coefficient of thermal expansion (CTE) and mechanical stiffness between different materials, as well as stress/strain caused by "piezoelectric" effects (i.e. mechanical deformation caused by an electric field, and conversely voltage induced by mechanical stress) in the AlGaN and GaN device portions (both

  10. Efficient continuous-wave nonlinear frequency conversion in high-Q Gallium Nitride photonic crystal cavities on Silicon

    CERN Document Server

    Mohamed, Mohamed Sabry; Carlin, Jean-François; Minkov, Momchil; Gerace, Dario; Savona, Vincenzo; Grandjean, Nicolas; Galli, Matteo; Houdré, Romuald

    2016-01-01

    We report on nonlinear frequency conversion from the telecom range via second harmonic generation (SHG) and third harmonic generation (THG) in suspended gallium nitride slab photonic crystal (PhC) cavities on silicon, under continuous-wave resonant excitation. Optimized two-dimensional PhC cavities with augmented far-field coupling have been characterized with quality factors as high as 4.4$\\times10^{4}$, approaching the computed theoretical values. The strong enhancement in light confinement has enabled efficient SHG, achieving normalized conversion efficiency of 2.4$\\times10^{-3}$ $W^{-1}$, as well as simultaneous THG. SHG emission power of up to 0.74 nW has been detected without saturation. The results herein validate the suitability of gallium nitride for integrated nonlinear optical processing.

  11. Synthesis of L-cystine nanotubes by alkalinization of L-cysteine in the presence of gallium nitride

    Science.gov (United States)

    Arizaga, Gregorio Guadalupe Carbajal

    2013-12-01

    The alkaline oxidation of L-cysteine (L-Cys) was conducted in aqueous media forming the insoluble L-cystine dimer as confirmed by X-ray diffraction. In another experiment, a gallium nitride film was added to the L-Cys solution and the L-cystine crystals presented a preferential growth. The transmission electron microscopy images showed the formation of single- and multi-wall L-cystine nanotubes. The infrared and high resolution electron microscopy data suggested that the growth of the tubes resulted from the successive staking of L-cystine dimers onto the (0 0 1) family of planes, which was a consequence of the ionic assembly between L-cystine over a layer of L-Cys molecules previously grafted to the gallium nitride particles.

  12. The effect of gallium nitride on long-term culture induced aging of neuritic function in cerebellar granule cells.

    Science.gov (United States)

    Chen, Chi-Ruei; Young, Tai-Horng

    2008-04-01

    Gallium nitride (GaN) has been developed for a variety of microelectronic and optical applications due to its unique electric property and chemical stability. In the present study, n-type and p-type GaN were used as substrates to culture cerebellar granule neurons to examine the effect of GaN on cell response for a long-term culture period. It was found that GaN could rapidly induce cultured neurons to exhibit a high phosphorylated Akt level after 20h of incubation. It was assumed that the anti-apoptotic effect of Akt phosphorylation could be correlated with cell survival, neurite growth and neuronal function for up to 35 days of incubation. Morphological studies showed GaN induced larger neuronal aggregates and neurite fasciculation to exhibit a dense fiber network after 8 days of incubation. Western blot analysis and immunocytochemical characterization showed that GaN still exhibited the expression of neurite growth and function, such as high levels of GAP-43, synapsin I and synaptophysin even after 35 days of incubation. In addition, survival of cerebellar granule neurons on GaN was improved by the analysis of lactate dehydrogenase (LDH) release from damaged cells. These results indicated that neuronal connections were formed on GaN by a gradual process from Akt activation and cell aggregation to develop neurite growth, fasciculation and function. Therefore, GaN offers a good model system to identify a well-characterized pattern of neuronal behavior for a long-term culture period, consistent with the development of a neurochip requiring the integration of biological system and semiconductor material.

  13. Homoepitaxial growth of gallium nitride and aluminum nitride and its effects on device properties

    Science.gov (United States)

    Grandusky, James R.

    Lattice and thermal mismatch between epitaxial layers and substrates have long been the major challenge in obtaining high quality devices in the III-Nitride material system due to the lack of availability of native substrates. Recently methods for obtaining high quality free standing native substrates have been achieved and these products are beginning to enter the commercial market. However the quality of these substrates is significantly lower than those in traditional substrates such as Si and GaAs and the high cost and low availability makes it difficult to study the homoepitaxial growth. In order to use these substrates for epitaxial growth, one first must understand what features are needed for the substrates to be epi ready. In addition, one must understand what features in the substrates impact optoelectronic device performances most significantly. Initial homoepitaxial growth was carried out on both AIN and GaN substrates. On AIN substrates it was found that annealing the sample prior to growth was very important to obtain improved surface morphologies for the homoepitaxial layers. Similar annealing steps were attempted on GaN substrates, however annealing under hydrogen left large Ga droplets on the surface. For homoepitaxy on HVPE GaN substrates, the substrate characteristics, such as bowing, surface morphology, structural properties, and optical properties were found to have a large influence on growth and device performance. Even with a reduced dislocation density, substrates with poor characteristics performed worse than devices on GaN/sapphire. The effect of polishing process on the substrates was found to be very important and substrates with subsurface damage led to poor growth, even though the starting surface was very smooth. Optimization of a thin GaN layer and a multiple quantum well structure revealed very different optimum growth conditions for the HVPE substrates and the GaN/sapphire templates. Theoretical modeling using density functional

  14. In situ chemical functionalization of gallium nitride with phosphonic acid derivatives during etching.

    Science.gov (United States)

    Wilkins, Stewart J; Greenough, Michelle; Arellano, Consuelo; Paskova, Tania; Ivanisevic, Albena

    2014-03-04

    In situ functionalization of polar (c plane) and nonpolar (a plane) gallium nitride (GaN) was performed by adding (3-bromopropyl) phosphonic acid or propyl phosphonic acid to a phosphoric acid etch. The target was to modulate the emission properties and oxide formation of GaN, which was explored through surface characterization with atomic force microscopy, X-ray photoelectron spectroscopy, photoluminescence (PL), inductively coupled plasma-mass spectrometry, and water contact angle. The use of (3-bromopropyl) phosphonic acid and propyl phosphonic acid in phosphoric acid demonstrated lower amounts of gallium oxide formation and greater hydrophobicity for both sample sets, while also improving PL emission of polar GaN samples. In addition to crystal orientation, growth-related factors such as defect density in bulk GaN versus thin GaN films residing on sapphire substrates were investigated as well as their responses to in situ functionalization. Thin nonpolar GaN layers were the most sensitive to etching treatments due in part to higher defect densities (stacking faults and threading dislocations), which accounts for large surface depressions. High-quality GaN (both free-standing bulk polar and bulk nonpolar) demonstrated increased sensitivity to oxide formation. Room-temperature PL stands out as an excellent technique to identify nonradiative recombination as observed in the spectra of heteroepitaxially grown GaN samples. The chemical methods applied to tune optical and physical properties of GaN provide a quantitative framework for future novel chemical and biochemical sensor development.

  15. Novel approach to the growth and characterization of aligned epitaxial gallium nitride nanowires

    Science.gov (United States)

    Henry, Tania Alicia

    Nanowire devices are potential building blocks for complex electronic circuitry, however, challenges such as in-place alignment, precise positioning and nanowire device integration need to be addressed. In this work selective area grown (SAG), micron sized gallium nitride (GaN) mesas were used as growth substrates for lateral epitaxial GaN nanowire arrays. The thermodynamically stable mesa facets provide a crystallographic match for directed nanowire synthesis by minimizing the surface energy at the interface between the nanowire and substrate Nanowires grow from the sidewalls of GaN mesas forming parallel and hexagonal networks. Alignment occurs in the nonpolar m-axis and semipolar directions respectively. Gallium nitride nanowires are interconnected between thermodynamically stable and smooth pyramidal (10ll) , and (1l22) surfaces of adjacent GaN mesas, and they also grow from a single mesa to form free-standing nanowire cantilevers. The synthesis of lateral free-standing nanowires has led to exciting studies of their structural, electrical, and optical properties. Characterization of the electrical properties is carried out by in situ probing of single nanowires on the growth substrate inside a scanning electron microscope (SEM). The current transport is found to be largely dominated by thermionic field emission and Fowler-Nordheim tunneling, and is significantly limited by a large contact resistance at the probe-nanowire interface. The carrier concentration and mobilities of the probed nanowires are extracted and are in agreement with standard field effects transistors (FETs) fabricated from nanowires grown using similar growth conditions. These results reveal that electrical probing of lateral GaN nanowires is a reliable means of characterizing their electrical properties once the interface resistance between the probe and nanowire is considered. The optical properties of the nanowires were investigated. Photon emission at 3.26 eV dominated the

  16. Native point defects in indium nitride and indium-rich indium gallium nitride alloys

    Science.gov (United States)

    Li, Sonny Xiao-Zhe

    The recent discovery of the narrow bandgap of InN of 0.7 eV has attracted strong scientific interests on the fundamental properties and possible applications of InN and its ternary alloys. The first part of this thesis was inspired by the proposal of using InxGa1-x N alloy to build high efficiency solar cell for space applications. To test the irradiation hardness of InN and InxGa 1-xN, we have irradiated numerous samples with energetic particles (1-2 MeV electrons, protons, and 4He+ particles). InN and InxGa1-xN displayed superior radiation hardness over current multi-junction solar cell materials such as GaAs and GaInP in terms of electronic and optical properties. Free electron concentrations in InN and In-rich InxGa 1-xN increased with irradiation dose but saturated at a sufficiently high damage dose. According to the amphoteric defect model, the doping effect and the electron concentration saturation originates from irradiation-induced native donors and Fermi level pinning at the Fermi level stabilization energy (EFS). The EFS, an average energy of all localized native defects, dictates the electronic properties (donor or acceptor) of the native point defects. The electron concentration saturation and Fermi level pinning lead to profound changes in the optical properties. Absorption spectra shift to higher energy due to the conduction band-filling effect (Burstein-Moss shift). Photoluminescence (PL) signals broadened and shifted to higher energy as the k-conservation rule collapsed with irradiation damage. The PL intensity of increased slightly with higher carrier concentration before it became quenched by the irradiation-induced carrier traps. Capacitance-voltage (CV) measurements show that the pinning of the surface Fermi energy at EFS is also responsible for the surface electron accumulation effect in InN and In-rich In xGa1-xN alloys. The second part of this thesis focuses on the hydrostatic pressure dependence of group III-nitride alloys. The hydrostatic

  17. Optical waveguide loss minimized into gallium nitride based structures grown by metal organic vapor phase epitaxy

    Science.gov (United States)

    Stolz, A.; Cho, E.; Dogheche, E.; Androussi, Y.; Troadec, D.; Pavlidis, D.; Decoster, D.

    2011-04-01

    The waveguide properties are reported for wide bandgap gallium nitride (GaN) structures grown by metal organic vapor phase epitaxy on sapphire using a AlN/GaN short period-superlattice (SPS) buffer layer system. A detailed optical characterization of GaN structures has been performed using the prism coupling technique in order to evaluate its properties and, in particular, the refractive index dispersion and the propagation loss. In order to identify the structural defects in the samples, we performed transmission electron microscopy analysis. The results suggest that AlN/GaN SPS plays a role in acting as a barrier to the propagation of threading dislocations in the active GaN epilayer; above this defective region, the dislocations density is remarkably reduced. The waveguide losses were reduced to a value around 0.65dB/cm at 1.55 μm, corresponding to the best value reported so far for a GaN-based waveguide.

  18. Electrical and optical properties of silicon-doped gallium nitride polycrystalline films

    Indian Academy of Sciences (India)

    S R Bhattacharyya; A K Pal

    2008-02-01

    Si-doped GaN films in polycrystalline form were deposited on quartz substrates at deposition temperatures ranging from 300–623 K using r.f. sputtering technique. Electrical, optical and microstructural properties were studied for these films. It was observed that films deposited at room temperature contained mainly hexagonal gallium nitride (ℎ-GaN) while films deposited at 623 K were predominantly cubic (-GaN) in nature. The films deposited at intermediate temperatures were found to contain both the hexagonal and cubic phases of GaN. Studies on the variation of conductivity with temperature indicated Mott’s hopping for films containing -GaN while Efros and Shklovskii (E–S) hopping within the Coulomb gap was found to dominate the carrier transport mechanism in the films containing ℎ-GaN. A crossover from Mott’s hopping to E–S hopping in the `soft’ Coulomb gap was noticed with lowering of temperature for films containing mixed phases of GaN. The relative intensity of the PL peak at ∼ 2.73 eV to that for peak at ∼ 3.11 eV appearing due to transitions from deep donor to valence band or shallow acceptors decreased significantly at higher temperature. Variation of band gap showed a bowing behaviour with the amount of cubic phase present in the films.

  19. Nanoporous Gallium Nitride Through Anisotropic Metal-Assisted Electroless Photochemical Wet Etching Technique

    Science.gov (United States)

    Perumal, R.; Hassan, Z.

    2016-12-01

    Nanoporous gallium nitride (GaN) has many potential applications in light-emitting diodes (LEDs), photovoltaics, templates and chemical sensors. This article reports the porosification of GaN through UV enhanced metal-assisted electroless photochemical wet etching technique using three different acid-based etchants and platinum served as catalyst for porosification. The etching process was conducted at room temperature for a duration of 90min. The morphological, structural, spectral and optical features of the developed porous GaN were studied with appropriate characterization techniques and the obtained results were presented. Field emission scanning electron micrographs exhibited the porosity nature along with excellent porous network of the etched samples. Structural studies confirmed the mono crystalline quality of the porous nanostructures. Raman spectral analyzes inferred the presenting phonon modes such as E2 (TO) and A1 (LO) in fabricated nanoporous structures. The resulted porous nanostructures hold the substantially enhanced photoluminescence intensity compared with the pristine GaN epitaxial film that is interesting and desirable for several advances in the applications of Nano-optoelectronic devices.

  20. Solution-based functionalization of gallium nitride nanowires for protein sensor development

    Science.gov (United States)

    Williams, Elissa H.; Davydov, Albert V.; Oleshko, Vladimir P.; Steffens, Kristen L.; Levin, Igor; Lin, Nancy J.; Bertness, Kris A.; Manocchi, Amy K.; Schreifels, John A.; Rao, Mulpuri V.

    2014-09-01

    A solution-based functionalization method for the specific and selective attachment of the streptavidin (SA) protein to gallium nitride (GaN) nanowires (NWs) is presented. By exploiting streptavidin's strong affinity for its ligand biotin, SA immobilization on GaN NWs was achieved by exposing the GaN NW surface to a 3-aminopropyltriethoxysilane (APTES) solution followed by reaction with biotin. Functionalization of the NWs with APTES was facilitated by the presence of an ≈ 1 nm thick surface oxide layer, which formed on the NWs after exposure to air and oxygen plasma. Biotinylation was accomplished by reacting the APTES-functionalized NWs with sulfo-N-hydroxysuccinimide-biotin at slightly alkaline pH. It was determined that the biotinylated GaN NW surface was specific towards the binding of SA and demonstrated no affinity towards a control protein, bovine serum albumin (BSA). There was however, evidence of non-specific, electrostatic binding of both the SA protein and the BSA protein to the APTES-coated NWs, revealing the importance of the biotinylation step. Successful SA immobilization on the biotinylated GaN NW surface was verified using fluorescence microscopy, field-emission scanning electron microscopy, high-resolution transmission electron microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. The functionalized GaN NWs demonstrate potential as biosensing platforms for the selective detection of proteins.

  1. Two single-layer porous gallium nitride nanosheets: A first-principles study

    Science.gov (United States)

    Zhang, Hui; Meng, Fan-Sun; Wu, Yan-Bin

    2017-01-01

    The gallium nitride (GaN) is a novel wide-gap semiconductor for photoelectric devices. In this paper, two 2D single-layer GaN crystal structures, called H-GaN and T-GaN, are discovered by the density functional theory calculations. The phase stability is confirmed by phonon dispersions. The sole-atom-thick crystals of H-GaN and T-GaN, has possess enlarged specific surface area than the graphene-like allotrope (g-GaN) due to the porous structures. In addition, they have indirect band gaps of 1.85-1.89 eV and the electronic structures can be further modulated by applied strains. For example, T-GaN transforms from an indirect semiconductor to a direct one due to compressed strains. Both the combination of high specific surface area and moderate band gaps make these 2D crystals potential high-efficiency photocatalysts. Our results will also stimulate the investigations on 2D GaN nano crystals with rich electronic structures for wide applications.

  2. On the solubility of gallium nitride in supercritical ammonia-sodium solutions

    Science.gov (United States)

    Griffiths, Steven; Pimputkar, Siddha; Speck, James S.; Nakamura, Shuji

    2016-12-01

    Due to the disparity between observed gallium nitride (GaN) growth under conditions for which literature reports normal solubility, GaN solubility in supercritical NH3-Na containing solutions was re-evaluated. Isothermal gravimetric experiments on polycrystalline GaN were performed in the temperature range (T =415-650 °C) for which retrograde growth of GaN routinely occurs (P ≈ 200 MPa, molar NH3:Na fill ratio =20:1). Two previously-unreported error contributions to the gravimetric determination of GaN solubility were identified: Ga-alloying of exposed Ni-containing components, and the presence of a dense, Ga-absorbing Na-rich, second phase under these conditions. Due to the inability to measure Ga-alloying of the exposed autoclave wall for each experiment, considerable scatter was introduced in the refined GaN solubility curve. No clear dependence of GaN solubility on temperature was resolvable, while most solubility values were determined to be within a band of 0.03-0.10 mol% GaN, normalized by fill NH3.

  3. Enhanced efficiency of Schottky-barrier solar cell with periodically nonhomogeneous indium gallium nitride layer

    Science.gov (United States)

    Anderson, Tom H.; Mackay, Tom G.; Lakhtakia, Akhlesh

    2017-01-01

    A two-dimensional finite-element model was developed to simulate the optoelectronic performance of a Schottky-barrier solar cell. The heart of this solar cell is a junction between a metal and a layer of n-doped indium gallium nitride (InξGaN) alloy sandwiched between a reflection-reducing front window and a periodically corrugated metallic back reflector. The bandgap of the InξGaN layer was varied periodically in the thickness direction by varying the parameter ξ∈(0,1). First, the frequency-domain Maxwell postulates were solved to determine the spatial profile of photon absorption and, thus, the generation of electron-hole pairs. The AM1.5G solar spectrum was taken to represent the incident solar flux. Next, the drift-diffusion equations were solved for the steady-state electron and hole densities. Numerical results indicate that a corrugated back reflector of a period of 600 nm is optimal for photon absorption when the InξGaN layer is homogeneous. The efficiency of a solar cell with a periodically nonhomogeneous InξGaN layer may be higher by as much as 26.8% compared to the analogous solar cell with a homogeneous InξGaN layer.

  4. Metasurfaces based on Gallium Nitride High Contrast Gratings at Visible Range

    Science.gov (United States)

    Wang, Zhenhai; He, Shumin; Liu, Qifa; Wang, Wei; Wang, Yongjin; Zhu, Hongbo; Grünberg Research Centre Team

    2015-03-01

    Metasurfaces are currently attracting global attention due to their ability to achieve full control of light propagation. However, these metasurfaces have thus far been constructed mostly from metallic materials, which greatly limit the diffraction efficiencies because of the ohmic losses. Semiconducting metasurfaces offer one potential solution to the issue of losses. Besides, the use of semiconducting materials can broaden the applicability of metasurfaces, as they enable facile integration with electronics and mechanical systems and can benefit from mature semiconductor fabrication technologies. We have proposed visible-light metasurfaces (VLMs) capable of serving as lenses and beam deflecting elements based on gallium nitride (GaN) high contrast gratings (HCGs). By precisely manipulating the wave-fronts of the transmitted light, we theoretically demonstrate an HCG focusing lens with transmissivity of 83.0% and numerical aperture of 0.77, and a VLM with beam deflection angle of 6.03° and transmissivity as high as 93.3%. The proposed metasurfaces are promising for GaN-based visible light-emitting diodes (LEDs), which would be robust and versatile for controlling the output light propagation and polarization, as well as enhancing the extraction efficiency of the LEDs.

  5. Surface Preparation and Deposited Gate Oxides for Gallium Nitride Based Metal Oxide Semiconductor Devices

    Directory of Open Access Journals (Sweden)

    Paul C. McIntyre

    2012-07-01

    Full Text Available The literature on polar Gallium Nitride (GaN surfaces, surface treatments and gate dielectrics relevant to metal oxide semiconductor devices is reviewed. The significance of the GaN growth technique and growth parameters on the properties of GaN epilayers, the ability to modify GaN surface properties using in situ and ex situ processes and progress on the understanding and performance of GaN metal oxide semiconductor (MOS devices are presented and discussed. Although a reasonably consistent picture is emerging from focused studies on issues covered in each of these topics, future research can achieve a better understanding of the critical oxide-semiconductor interface by probing the connections between these topics. The challenges in analyzing defect concentrations and energies in GaN MOS gate stacks are discussed. Promising gate dielectric deposition techniques such as atomic layer deposition, which is already accepted by the semiconductor industry for silicon CMOS device fabrication, coupled with more advanced physical and electrical characterization methods will likely accelerate the pace of learning required to develop future GaN-based MOS technology.

  6. Congruent melting of gallium nitride at 6 GPa and its application to single-crystal growth.

    Science.gov (United States)

    Utsumi, Wataru; Saitoh, Hiroyuki; Kaneko, Hiroshi; Watanuki, Tetsu; Aoki, Katsutoshi; Shimomura, Osamu

    2003-11-01

    The synthesis of large single crystals of GaN (gallium nitride) is a matter of great importance in optoelectronic devices for blue-light-emitting diodes and lasers. Although high-quality bulk single crystals of GaN suitable for substrates are desired, the standard method of cooling its stoichiometric melt has been unsuccessful for GaN because it decomposes into Ga and N(2) at high temperatures before its melting point. Here we report that applying high pressure completely prevents the decomposition and allows the stoichiometric melting of GaN. At pressures above 6.0 GPa, congruent melting of GaN occurred at about 2,220 degrees C, and decreasing the temperature allowed the GaN melt to crystallize to the original structure, which was confirmed by in situ X-ray diffraction. Single crystals of GaN were formed by cooling the melt slowly under high pressures and were recovered at ambient conditions.

  7. Unusual strategies for using indium gallium nitride grown on silicon (111) for solid-state lighting.

    Science.gov (United States)

    Kim, Hoon-sik; Brueckner, Eric; Song, Jizhou; Li, Yuhang; Kim, Seok; Lu, Chaofeng; Sulkin, Joshua; Choquette, Kent; Huang, Yonggang; Nuzzo, Ralph G; Rogers, John A

    2011-06-21

    Properties that can now be achieved with advanced, blue indium gallium nitride light emitting diodes (LEDs) lead to their potential as replacements for existing infrastructure in general illumination, with important implications for efficient use of energy. Further advances in this technology will benefit from reexamination of the modes for incorporating this materials technology into lighting modules that manage light conversion, extraction, and distribution, in ways that minimize adverse thermal effects associated with operation, with packages that exploit the unique aspects of these light sources. We present here ideas in anisotropic etching, microscale device assembly/integration, and module configuration that address these challenges in unconventional ways. Various device demonstrations provide examples of the capabilities, including thin, flexible lighting "tapes" based on patterned phosphors and large collections of small light emitters on plastic substrates. Quantitative modeling and experimental evaluation of heat flow in such structures illustrates one particular, important aspect of their operation: small, distributed LEDs can be passively cooled simply by direct thermal transport through thin-film metallization used for electrical interconnect, providing an enhanced and scalable means to integrate these devices in modules for white light generation.

  8. Basic Equations for the Modeling of Gallium Nitride (gan) High Electron Mobility Transistors (hemts)

    Science.gov (United States)

    Freeman, Jon C.

    2003-01-01

    Gallium nitride (GaN) is a most promising wide band-gap semiconductor for use in high-power microwave devices. It has functioned at 320 C, and higher values are well within theoretical limits. By combining four devices, 20 W has been developed at X-band. GaN High Electron Mobility Transistors (HEMTs) are unique in that the two-dimensional electron gas (2DEG) is supported not by intentional doping, but instead by polarization charge developed at the interface between the bulk GaN region and the AlGaN epitaxial layer. The polarization charge is composed of two parts: spontaneous and piezoelectric. This behavior is unlike other semiconductors, and for that reason, no commercially available modeling software exists. The theme of this document is to develop a self-consistent approach to developing the pertinent equations to be solved. A Space Act Agreement, "Effects in AlGaN/GaN HEMT Semiconductors" with Silvaco Data Systems to implement this approach into their existing software for III-V semiconductors, is in place (summer of 2002).

  9. Heat resistive dielectric multi-layer micro-mirror array in epitaxial lateral overgrowth gallium nitride.

    Science.gov (United States)

    Huang, Chen-Yang; Ku, Hao-Min; Liao, Wei-Tsai; Chao, Chu-Li; Tsay, Jenq-Dar; Chao, Shiuh

    2009-03-30

    Ta2O5 / SiO2 dielectric multi-layer micro-mirror array (MMA) with 3mm mirror size and 6mm array period was fabricated on c-plane sapphire substrate. The MMA was subjected to 1200 degrees C high temperature annealing and remained intact with high reflectance in contrast to the continuous multi-layer for which the layers have undergone severe damage by 1200 degrees C annealing. Epitaxial lateral overgrowth (ELO) of gallium nitride (GaN) was applied to the MMA that was deposited on both sapphire and sapphire with 2:56 mm GaN template. The MMA was fully embedded in the ELO GaN and remained intact. The result implies that our MMA is compatible to the high temperature growth environment of GaN and the MMA could be incorporated into the structure of the micro-LED array as a one to one micro backlight reflector, or as the patterned structure on the large area LED for controlling the output light.

  10. Giant piezoelectric size effects in zinc oxide and gallium nitride nanowires. A first principles investigation.

    Science.gov (United States)

    Agrawal, Ravi; Espinosa, Horacio D

    2011-02-09

    Nanowires made of materials with noncentrosymmetric crystal structure are under investigation for their piezoelectric properties and suitability as building blocks for next-generation self-powered nanodevices. In this work, we investigate the size dependence of piezoelectric coefficients in nanowires of two such materials - zinc oxide and gallium nitride. Nanowires, oriented along their polar axis, ranging from 0.6 to 2.4 nm in diameter were modeled quantum mechanically. A giant piezoelectric size effect is identified for both GaN and ZnO nanowires. However, GaN exhibits a larger and more extended size dependence than ZnO. The observed size effect is discussed in the context of charge redistribution near the free surfaces leading to changes in local polarization. The study reveals that local changes in polarization and reduction of unit cell volume with respect to bulk values lead to the observed size effect. These results have strong implication in the field of energy harvesting, as piezoelectric voltage output scales with the piezoelectric coefficient.

  11. Improved performance of dye-sensitized solar cells using gallium nitride-titanium dioxide composite photoelectrodes.

    Science.gov (United States)

    Huang, Yin-Rou; Huang, Tzu-Wei; Wang, Tzu-Hui; Tsai, Yu-Chen

    2014-08-15

    Dye-sensitized solar cells (DSSCs) are fabricated with gallium nitride-titanium dioxide (GaN-TiO2) composite photoelectrodes to enhance the power conversion efficiency. The value of power conversion efficiency increases with the incorporation of GaN in TiO2 matrix and reaches a maximum at 0.05 wt% GaN. Internal resistance in the DSSC is characterized by electrochemical impedance spectroscopy (EIS). From the EIS of electrolyte/dye/GaN-TiO2 interface resistances under illumination and in the dark, a decrease in the charge transfer resistance and an increase in the charge recombination resistance of the DSSCs are obtained after the inclusion of GaN (0.01-0.05 wt%) in the TiO2 matrix. The power conversion efficiency of the DSSC based on the GaN (0.05 wt%)-TiO2 composite photoelectrode is enhanced by ∼61% in comparison with a pristine TiO2 photoelectrode.

  12. Observation of surface plasmon polariton pumping of optical eigenmodes of gold-decorated gallium nitride nanowires.

    Science.gov (United States)

    Sundararajan, Jency Pricilla; Bakharev, Pavel; Niraula, Ishwar; Kengne, Blaise Alexis Fouetio; MacPherson, Quinn; Sargent, Meredith; Hare, Brian; McIlroy, David N

    2012-10-10

    The photocurrent of individual gallium nitride (GaN) nanowires decorated with Au nanoparticles as function of the wavelength of light (405 nm (blue), 532 nm (green), and 632.8 nm (red)) and nanowire diameter (80 to 400 nm) is reported. The photocurrent scales with photon energy but oscillates with nanowire diameter. The oscillations are described in terms of the scattering of surface plasmon polaritons into allowed transverse magnetic electromagnetic modes of the nanowire that have maximum intensities in the undepleted region of the nanowire. These oscillations do not occur below a nanowire diameter of ~200 nm due to the depletion layer formed at the Au-GaN interface, which completely depletes the nanowire, that is, there is an insufficient density of carriers that can be excited into the conduction band. On the basis of estimations of the depletion depth and solutions of the Helmholtz equation, the maxima in the photocurrent for d > 200 nm are assigned to the two lowest azimuthally symmetric transverse magnetic eigenmodes: (m = 0, n = 1) and (m = 0, n = 2), which have maximum electric field intensities within the undepleted region of the GaN nanowire. The outcome of this work could have far reaching implications on the development of nanophotonics.

  13. Photochemical functionalization of gallium nitride thin films with molecular and biomolecular layers.

    Science.gov (United States)

    Kim, Heesuk; Colavita, Paula E; Metz, Kevin M; Nichols, Beth M; Sun, Bin; Uhlrich, John; Wang, Xiaoyu; Kuech, Thomas F; Hamers, Robert J

    2006-09-12

    We demonstrate that photochemical functionalization can be used to functionalize and photopattern the surface of gallium nitride crystalline thin films with well-defined molecular and biomolecular layers. GaN(0001) surfaces exposed to a hydrogen plasma will react with organic molecules bearing an alkene (C=C) group when illuminated with 254 nm light. Using a bifunctional molecule with an alkene group at one end and a protected amine group at the other, this process can be used to link the alkene group to the surface, leaving the protected amine exposed. Using a simple contact mask, we demonstrate the ability to directly pattern the spatial distribution of these protected amine groups on the surface with a lateral resolution of <12 mum. After deprotection of the amines, single-stranded DNA oligonucleotides were linked to the surface using a bifunctional cross-linker. Measurements using fluorescently labeled complementary and noncomplementary sequences show that the DNA-modified GaN surfaces exhibit excellent selectivity, while repeated cycles of hybridization and denaturation in urea show good stability. These results demonstrate that photochemical functionalization can be used as an attractive starting point for interfacing molecular and biomolecular systems with GaN and other compound semiconductors.

  14. In-situ multi-information measurement system for preparing gallium nitride photocathode

    Institute of Scientific and Technical Information of China (English)

    Fu Xiao-Qian; Chang Ben-Kang; Qian Yun-Sheng; Zhang Jun-Ju

    2012-01-01

    We introduce the first domestic in-situ multi-information measurement system for a gallium nitride (GaN) photocathode.This system can successfully fulfill heat cleaning and activation for GaN in an ultrahigh vacuum environment and produce a GaN photocathode with a negative electron affinity (NEA) status.Information including the heat cleaning temperature,vacuum degree,photocurrent,electric current of cesium source,oxygen source,and the most important information about the spectral response,or equivalently,the quantum efficiency (QE) can be obtained during preparation.The preparation of a GaN photocathode with this system indicates that the optimal heating temperature in a vacuum is about 700 ℃.We also develop a method of quickly evaluating the atomically clean surface with the vacuum degree versus wavelength curve to prevent possible secondary contamination when the atomic level cleaning surface is tested with X-ray photoelectron spectroscopy.The photocurrent shows a quick enhancement when the current ratio between the cesium source and oxygen source is 1.025.The spectral response of the GaN photocathode is fiat in a wavelength range from 240 nm to 365 nm,and an abrupt decline is observed at 365 nm,which demonstrates that with the in-situ multi-information measurement system the NEA GaN photocathode can be successfully prepared.

  15. Design and analysis of vertical-channel gallium nitride (GaN) junctionless nanowire transistors (JNT).

    Science.gov (United States)

    Seo, Jae Hwa; Yoon, Young Jun; Lee, Hwan Gi; Yoo, Gwan Min; Jo, Young-Woo; Son, Dong-Hyeok; Lee, Jung-Hee; Cho, Eou-Sik; Cho, Seongjae; Kang, In Man

    2014-11-01

    Vertical-channel gallium nitride (GaN) junctionless nanowire transistor (JNT) has been designed and characterized by technology computer-aided design (TCAD) simulations. Various characteristics such as wide bandgap, strong polariztion field, and high electron velocity make GaN one of the attractive materials in advanced electronics in recent times. Nanowire-structured GaN can be applicable to various transistors for enhanced electrical performances by its geometrical feature. In this paper, we analyze the direct-current (DC) characteristics depending on various channel doping concentrations (N(ch)) and nanowire radii (R(NW)). Furthermore, the radio-frequency (RF) characteristics under optimized conditions are extracted by small-signal equivalent circuit modeling. For the optimally designed vertical GaN JNT demonstrated on-state current (I(on)) of 345 μA/μm and off-state current (I(off)) of 3.7 x 10(-18) A/μm with a threshold voltage (V(t)) of 0.22 V, and subthreshold swing (S) of 68 mV/dec. Besides, f(T) and f(max) under different operating conditions (gate voltage, V(GS)) have been obtained.

  16. In-situ multi-information measurement system for preparing gallium nitride photocathode

    Science.gov (United States)

    Fu, Xiao-Qian; Chang, Ben-Kang; Qian, Yun-Sheng; Zhang, Jun-Ju

    2012-03-01

    We introduce the first domestic in-situ multi-information measurement system for a gallium nitride (GaN) photocathode. This system can successfully fulfill heat cleaning and activation for GaN in an ultrahigh vacuum environment and produce a GaN photocathode with a negative electron affinity (NEA) status. Information including the heat cleaning temperature, vacuum degree, photocurrent, electric current of cesium source, oxygen source, and the most important information about the spectral response, or equivalently, the quantum efficiency (QE) can be obtained during preparation. The preparation of a GaN photocathode with this system indicates that the optimal heating temperature in a vacuum is about 700 °C. We also develop a method of quickly evaluating the atomically clean surface with the vacuum degree versus wavelength curve to prevent possible secondary contamination when the atomic level cleaning surface is tested with X-ray photoelectron spectroscopy. The photocurrent shows a quick enhancement when the current ratio between the cesium source and oxygen source is 1.025. The spectral response of the GaN photocathode is flat in a wavelength range from 240 nm to 365 nm, and an abrupt decline is observed at 365 nm, which demonstrates that with the in-situ multi-information measurement system the NEA GaN photocathode can be successfully prepared.

  17. The magneto-optical properties of semiconductors and the band structure of gallium nitride

    CERN Document Server

    Shields, P A

    2001-01-01

    the wells, and observing a resonant phenomenon from an undoped GaN/Al sub x Ga sub 1 sub - sub x N single heterojunction. The oscillating peak intensity was understood in terms of the changing screening efficiency of the two-dimensional electron gas. Finally, many-body effects within an electron-hole plasma in ln sub x Al sub y Ga sub 1 sub - sub x sub - sub y As quantum wells have been explored to study the effects of mass renormalisation at carrier densities typically present in laser devices. A peak in the mass renormalisation confirms the importance of excitonic correlations in the excited plasma. This thesis has applied magneto-optical techniques to enable a better understanding of the band structure of gallium nitride, particularly the complex behaviour expected as a result of strong valence band mixing. Effective hole masses are deduced from free excitonic-like transitions observed in magneto-reflectivity, to give a heavy A hole mass of 1.3 m sub o and the first experimental suggestion of a light B ban...

  18. Exfoliation of Threading Dislocation-Free, Single-Crystalline, Ultrathin Gallium Nitride Nanomembranes

    KAUST Repository

    Elafandy, Rami T.

    2014-04-01

    Despite the recent progress in gallium nitride (GaN) growth technology, the excessively high threading dislocation (TD) density within the GaN crystal, caused by the reliance on heterogeneous substrates, impedes the development of high-efficiency, low-cost, GaN-based heterostructure devices. For the first time, the chemical exfoliation of completely TD-free, single-crystalline, ultrathin (tens of nanometers) GaN nanomembranes is demonstrated using UV-assisted electroless chemical etching. These nanomembranes can act as seeding layers for subsequent overgrowth of high-quality GaN. A model is proposed, based on scanning and transmission electron microscopy as well as optical measurements to explain the physical processes behind the formation of the GaN nanomembranes. These novel nanomembranes, once transferred to other substrates, present a unique and technologically attractive path towards integrating high-efficiency GaN optical components along with silicon electronics. Interestingly, due to their nanoscale thickness and macroscopic sizes, these nanomembranes may enable the production of flexible GaN-based optoelectronics. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  19. Surface characterization of gallium nitride modified with peptides before and after exposure to ionizing radiation in solution.

    Science.gov (United States)

    Berg, Nora G; Nolan, Michael W; Paskova, Tania; Ivanisevic, Albena

    2014-12-30

    An aqueous surface modification of gallium nitride was employed to attach biomolecules to the surface. The modification was a simple two-step process using a single linker molecule and mild temperatures. The presence of the peptide on the surface was confirmed with X-ray photoelectron spectroscopy. Subsequently, the samples were placed in water baths and exposed to ionizing radiation to examine the effects of the radiation on the material in an environment similar to the body. Surface analysis confirmed degradation of the surface of GaN after radiation exposure in water; however, the peptide molecules successfully remained on the surface following exposure to ionizing radiation. We hypothesize that during radiation exposure of the samples, the radiolysis of water produces peroxide and other reactive species on the sample surface. Peroxide exposure promotes the formation of a more stable layer of gallium oxyhydroxide which passivates the surface better than other oxide species.

  20. GROWTH, MORPHOLOGICAL, STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF NITROGEN DOPED ZINC OXIDE THIN FILM ON POROUS GALLIUM NITRIDE TEMPLATE

    OpenAIRE

    2016-01-01

    Gallium nitride (GaN) is susceptible of producing efficient display and lighting devices.  Low cost hybrid heterostructured lighting devices are developed by combining zinc oxide (ZnO) with GaN that has gained much more research interest, nowadays.  Porous GaN receives a great deal of attraction by its excellent and improved properties compared with its bulk counterpart.  Several potential applications have been realized, including for serving as a strain-relaxed substrates for...

  1. A Monolithically Integrated Gallium Nitride Nanowire/Silicon Solar Cell Photocathode for Selective Carbon Dioxide Reduction to Methane.

    Science.gov (United States)

    Wang, Yichen; Fan, Shizhao; AlOtaibi, Bandar; Wang, Yongjie; Li, Lu; Mi, Zetian

    2016-06-20

    A gallium nitride nanowire/silicon solar cell photocathode for the photoreduction of carbon dioxide (CO2 ) is demonstrated. Such a monolithically integrated nanowire/solar cell photocathode offers several unique advantages, including the absorption of a large part of the solar spectrum and highly efficient carrier extraction. With the incorporation of copper as the co-catalyst, the devices exhibit a Faradaic efficiency of about 19 % for the 8e(-) photoreduction to CH4 at -1.4 V vs Ag/AgCl, a value that is more than thirty times higher than that for the 2e(-) reduced CO (ca. 0.6 %).

  2. Electron-phonon relaxation and excited electron distribution in gallium nitride

    Energy Technology Data Exchange (ETDEWEB)

    Zhukov, V. P. [Institute of Solid State Chemistry, Urals Branch of the Russian Academy of Sciences, Pervomayskaya st. 91, Yekaterinburg (Russian Federation); Donostia International Physics Center (DIPC), P. Manuel de Lardizabal 4, 20018 San Sebastian (Spain); Tyuterev, V. G., E-mail: valtyut00@mail.ru [Donostia International Physics Center (DIPC), P. Manuel de Lardizabal 4, 20018 San Sebastian (Spain); Tomsk State Pedagogical University, Kievskaya st. 60, Tomsk (Russian Federation); Tomsk State University, Lenin st. 36, Tomsk (Russian Federation); Chulkov, E. V. [Donostia International Physics Center (DIPC), P. Manuel de Lardizabal 4, 20018 San Sebastian (Spain); Tomsk State University, Lenin st. 36, Tomsk (Russian Federation); Departamento de Fisica de Materiales, Facultad de Ciencias Qumicas, UPV/EHU and Centro de Fisica de Materiales CFM-MPC and Centro Mixto CSIC-UPV/EHU, Apdo. 1072, 20080 San Sebastian (Spain); Echenique, P. M. [Donostia International Physics Center (DIPC), P. Manuel de Lardizabal 4, 20018 San Sebastian (Spain); Departamento de Fisica de Materiales, Facultad de Ciencias Qumicas, UPV/EHU and Centro de Fisica de Materiales CFM-MPC and Centro Mixto CSIC-UPV/EHU, Apdo. 1072, 20080 San Sebastian (Spain)

    2016-08-28

    We develop a theory of energy relaxation in semiconductors and insulators highly excited by the long-acting external irradiation. We derive the equation for the non-equilibrium distribution function of excited electrons. The solution for this function breaks up into the sum of two contributions. The low-energy contribution is concentrated in a narrow range near the bottom of the conduction band. It has the typical form of a Fermi distribution with an effective temperature and chemical potential. The effective temperature and chemical potential in this low-energy term are determined by the intensity of carriers' generation, the speed of electron-phonon relaxation, rates of inter-band recombination, and electron capture on the defects. In addition, there is a substantial high-energy correction. This high-energy “tail” largely covers the conduction band. The shape of the high-energy “tail” strongly depends on the rate of electron-phonon relaxation but does not depend on the rates of recombination and trapping. We apply the theory to the calculation of a non-equilibrium distribution of electrons in an irradiated GaN. Probabilities of optical excitations from the valence to conduction band and electron-phonon coupling probabilities in GaN were calculated by the density functional perturbation theory. Our calculation of both parts of distribution function in gallium nitride shows that when the speed of the electron-phonon scattering is comparable with the rate of recombination and trapping then the contribution of the non-Fermi “tail” is comparable with that of the low-energy Fermi-like component. So the high-energy contribution can essentially affect the charge transport in the irradiated and highly doped semiconductors.

  3. Adsorption and adhesion of common serum proteins to nanotextured gallium nitride.

    Science.gov (United States)

    Bain, Lauren E; Hoffmann, Marc P; Bryan, Isaac; Collazo, Ramón; Ivanisevic, Albena

    2015-02-14

    As the broader effort towards device and material miniaturization progresses in all fields, it becomes increasingly important to understand the implications of working with functional structures that approach the size scale of molecules, particularly when considering biological systems. It is well known that thin films and nanostructures feature different optical, electrical, and mechanical properties from their bulk composites; however, interactions taking place at the interface between nanomaterials and their surroundings are less understood. Here, we explore interactions between common serum proteins - serum albumin, fibrinogen, and immunoglobulin G - and a nanotextured gallium nitride surface. Atomic force microscopy with a carboxyl-terminated colloid tip is used to probe the 'activity' of proteins adsorbed onto the surface, including both the accessibility of the terminal amine to the tip as well as the potential for protein extension. By evaluating the frequency of tip-protein interactions, we can establish differences in protein behaviour on the basis of both the surface roughness as well as morphology, providing an assessment of the role of surface texture in dictating protein-surface interactions. Unidirectional surface features - either the half-unit cell steppes of as-grown GaN or those produced by mechanical polishing - appear to promote protein accessibility, with a higher frequency of protein extension events taking place on these surfaces when compared with less ordered surface features. Development of a full understanding of the factors influencing surface-biomolecule interactions can pave the way for specific surface modification to tailor the bio-material interface, offering a new path for device optimization.

  4. Vertical 2D/3D Semiconductor Heterostructures Based on Epitaxial Molybdenum Disulfide and Gallium Nitride.

    Science.gov (United States)

    Ruzmetov, Dmitry; Zhang, Kehao; Stan, Gheorghe; Kalanyan, Berc; Bhimanapati, Ganesh R; Eichfeld, Sarah M; Burke, Robert A; Shah, Pankaj B; O'Regan, Terrance P; Crowne, Frank J; Birdwell, A Glen; Robinson, Joshua A; Davydov, Albert V; Ivanov, Tony G

    2016-03-22

    When designing semiconductor heterostructures, it is expected that epitaxial alignment will facilitate low-defect interfaces and efficient vertical transport. Here, we report lattice-matched epitaxial growth of molybdenum disulfide (MoS2) directly on gallium nitride (GaN), resulting in high-quality, unstrained, single-layer MoS2 with strict registry to the GaN lattice. These results present a promising path toward the implementation of high-performance electronic devices based on 2D/3D vertical heterostructures, where each of the 3D and 2D semiconductors is both a template for subsequent epitaxial growth and an active component of the device. The MoS2 monolayer triangles average 1 μm along each side, with monolayer blankets (merged triangles) exhibiting properties similar to that of single-crystal MoS2 sheets. Photoluminescence, Raman, atomic force microscopy, and X-ray photoelectron spectroscopy analyses identified monolayer MoS2 with a prominent 20-fold enhancement of photoluminescence in the center regions of larger triangles. The MoS2/GaN structures are shown to electrically conduct in the out-of-plane direction, confirming the potential of directly synthesized 2D/3D semiconductor heterostructures for vertical current flow. Finally, we estimate a MoS2/GaN contact resistivity to be less than 4 Ω·cm(2) and current spreading in the MoS2 monolayer of approximately 1 μm in diameter.

  5. Fabrication of conducting-filament-embedded indium tin oxide electrodes: application to lateral-type gallium nitride light-emitting diodes.

    Science.gov (United States)

    Kim, Hee-Dong; Kim, Kyeong Heon; Kim, Su Jin; Kim, Tae Geun

    2015-11-02

    A novel conducting filament (CF)-embedded indium tin oxide (ITO) film is fabricated using an electrical breakdown method. To assess the performance of this layer as an ohmic contact, it is applied to GaN (gallium nitride) light-emitting diodes (LEDs) as a p-type electrode for comparison with typical GaN LEDs using metallic ITO. The operating voltage and output power of the LED with the CF embedded ITO are 3.93 V and 8.49 mW, respectively, at an injection current of 100 mA. This is comparable to the operating voltage and output power of the conventionally fabricated LEDs using metallic ITO (3.93 V and 8.43 mW). Moreover, the CF-ITO LED displays uniform and bright light emission indicating excellent current injection and spreading. These results suggest that the proposed method of forming ohmic contacts is at least as effective as the conventional method.

  6. Development of wide-band gap indium gallium nitride solar cells for high-efficiency photovoltaics

    Science.gov (United States)

    Jani, Omkar K.

    lowered. Subsequent generations of solar cell designs involve an evolutionary approach to enhance the open-circuit voltage and internal quantum efficiency of the solar cell. The suitability of p-type InGaN with band gaps as low as 2.5 eV is established by incorporating in a solar cell and measuring an open-circuit voltage of 2.1 V. Second generation InGaN solar cell design involving a 2.9 eV InGaN p-n junction sandwiched between p- and n-GaN layers yields internal quantum efficiencies as high as 50%; while sixth generation devices utilizing the novel n-GaN strained window-layer enhance the open circuit voltage of a 2.9 eV InGaN solar cell to 2 V. Finally, key aspects to further InGaN solar cell research, including integration of various designs, are recommended to improve the efficiency of InGaN solar cells. These results establish the potential of III-nitrides in ultra-high efficiency photovoltaics.

  7. Computational study on the growth of gallium nitride and a possible source of oxygen impurity.

    Science.gov (United States)

    Mondal, Bhaskar; Mandal, Debasish; Ghosh, Deepanwita; Das, Abhijit K

    2010-04-15

    The reaction pathways for the gallium nitride GaN growth by gas phase reaction of trimethylgallium (TMG) with ammonia is studied theoretically. Water is the most important impurity in ammonia, therefore its reaction with TMG is investigated as a possible source of oxygen impurity in GaN. Gallium oxide (GaO) formed by the reaction between TMG and H(2)O is predicted to be one of the possible source of oxygen impurity in GaN. The mechanisms and energetics of these reactions in the gas phase have been investigated by density functional B3LYP/[LANL2DZ-ECP + 6-31G(d,p)] method and ab initio MP2/[LANL2DZ-ECP + 6-31G(d,p)], CCSD(T)/[LANL2DZ-ECP + 6-31G(d,p)]//B3LYP/[LANL2DZ-ECP + 6-31G(d,p)], CCSD(T)/[LANL2DZ-ECP + 6-31G(d,p)]//MP2/[LANL2DZ-ECP + 6-31G(d,p)], and CCSD(T)/[LANL2DZ-ECP + Ahlrichs-VTZP]//MP2/[LANL2DZ-ECP + Ahlrichs-VTZP] methods. Both the reactions of TMG with NH(3) and H(2)O are modeled using pre-equilibrium charge-transfer complexes (CH(3))(3)Ga:NH(3) (C1) and (CH(3))(3)Ga:OH(2) (C2) having binding energies of 18.8 and 12.4 kcal/mol, respectively. The first step of the methane elimination reaction from the complexes proceeds through the saddle points TS1 and TS1a having activation barriers 37.0 and 22.6 kcal/mol for C1 and C2, respectively. The first CH(4) elimination step is exothermic for both the cases, but the exothermicity is 15.0 kcal/mol greater for CH(4) elimination from C2. The next step of methane elimination from the stable reaction intermediates (CH(3))(2)GaNH(2) and (CH(3))(3)GaOH has a very high activation barrier of 76.0 and 67.8 kcal/mol via saddle points TS2 and TS2a, respectively. The calculated reaction rates at 298.15 K for both the reactions are low but are comparable to each other. The total rate constant k(tot) for GaN formation is 2.07 x 10(-60) cm(3) molecule(-1) s(-1), and that for GaO formation is 6.85 x 10(-62) cm(3) molecule(-1) s(-1).

  8. SYNTHESIS OF THICK GALLIUM NITRIDE LAYERS BY METHOD OF MULTI-STAGE GROWTH ON SUBSTRATES WITH COLUMN STRUCTURE

    Directory of Open Access Journals (Sweden)

    Marina G. Mynbaeva

    2016-11-01

    Full Text Available Subject of Research.The paper deals with processes of formation and transformation of defects during multi-stage growth of thick gallium nitride layers with hydride vapor phase epitaxy on GaN/Al2O3 substrates with buried column pattern formed with the use of metal-organic vapor phase epitaxy. Methods. The growth of initial GaN layers was performed with the use of metal-organic vapor phase epitaxy. On the surface of the initial layers columns with the height of 800 nm were generated by means of ion etching. These columns were overgrown with 3-4 µm-thick GaN layers. On thus formed substrate multi-stage growth of GaN layers was performed with the use of hydride vapor-phase epitaxy. The total thickness of GaN layers was 100-1500 µm. The grown layers were studied by optical and electron microscopy and Raman spectroscopy. Main Results. Density of threading dislocations in the layers grown by hydride vapor-phase epitaxy was (3-6·107 cm-2, that was one order of magnitude lower than in the used substrate, and two to three orders lower than dislocation density in typical GaN layers grown on commercial sapphire substrates. Raman spectroscopy data were indicative of low level of mechanical stress in the layers and their high structural uniformity. It was established that under multi-stage growth conditions, non-catastrophic cracks (those that do not cause sample destruction are able to transform into macropores and appear to be an important structural element, serving to stress relaxation in the bulk of thick gallium nitride layers grown on foreign substrates. Practical Relevance. The results of the study can be used in the development of III-nitride heterostructures for optoelectronics and high-power and high-frequency microelectronics.

  9. White light-emitting diodes based on nonpolar and semipolar gallium nitride orientations

    Science.gov (United States)

    Demille, Natalie Fellows

    Gallium nitride has become one of the key components when fabricating white light-emitting diodes. Its use as the blue source in conjunction with a wavelength converter such as the yellow emitting phosphor YAG:Ce 3+ is a technology that is commercially available and usable for solid state lighting applications. Currently available white phosphor-based LEDs (pcLEDs) use the basal plane of wurtzite GaN as their source. Although research over the past couple decades has developed this technology into devices with good photometric performance and high reliability, the introduction of nonbasal plane wurtzite GaN orientations have benefits over basal plane GaN that can be incorporated into the white LED. The focus of this research deals with exploring white illumination on nonpolar and semipolar planes of GaN. Light extraction techniques will be described that allowed for high output powers and efficiencies on the c-plane as well as the (1100), (10 11), and (1122) planes of GaN. With higher performing devices, white pcLEDs were fabricated on c-plane, m-plane, and the (1011) semipolar plane. The novelty in the present research is producing white LEDs with nonbasal plane diodes which exhibit optical polarization anisotropy. This feature, absent on the basal plane, allows for tuning photometric quantities both electrically and optically. This is demonstrated on pcLEDs as well as dichromatic LEDs comprised solely of InGaN diodes. As a consequence of these measurements, an apparent optical polarization was seen to be occurring in the luminescence of the YAG:Ce3+ when the system absorbed linearly polarized light. Polarized emission in YAG:Ce3+ was explored by obtaining single crystals of YAG:Ce3+ with different planar orientations. The experiments led to the conclusion that crystal orientation plays no part in the optical polarization. It is suggested that the cause is a result of electric dipole transitions given by various selection rules between the Ce 3+ ion's 4f and 5d

  10. Design and Characterization of p-i-n Devices for Betavoltaic Microbatteries on Gallium Nitride

    Science.gov (United States)

    Khan, Muhammad Raziuddin A.

    Betavoltaic microbatteries convert nuclear energy released as beta particles directly into electrical energy. These batteries are well suited for electrical applications such as micro-electro-mechanical systems (MEMS), implantable medical devices and sensors. Such devices are often located in hard to access places where long life, micro-size and lightweight are required. The working principle of a betavoltaic device is similar to a photovoltaic device; they differ only in that the electron hole pairs (EHPs) are generated in the device by electrons instead of photons. In this study, the performance of a betavoltaic device fabricated from gallium nitride (GaN) is investigated for beta particle energies equivalent to Tritium (3H) and Nickel-63 (N63) beta sources. GaN is an attractive choice for fabricating betavoltaic devices due to its wide band gap and radiation resistance. Another advantage GaN has is that it can be alloyed with aluminum (Al) to further increase the bandgap, resulting in a higher output power and increased efficiency. Betavoltaic devices were fabricated on p-i-n GaN structures grown by metalorganic chemical vapor deposition (MOCVD). The devices were characterized using current - voltage (IV) measurements without illumination (light or beta), using a laser driven light source, and under an electron beam. Dark IV measurements showed a turn on-voltage of ~ 3.4 V, specific-on-resistance of 15.1 m O-cm2, and a leakage current of 0.5 mA at -- 10 V. A clear photo-response was observed when IV curves were measured for these devices under a light source at a wavelength of 310 nm (4.0 eV). These devices were tested under an electron beam in order to evaluate their behavior as betavoltaic microbatteries without using radioactive materials. Output power of 70 nW and 640 nW with overall efficiencies of 1.2% and 4.0% were determined at the average energy emission of 3H (5.6 keV) and 63N (17 keV) respectively.

  11. High-power X- and Ka-band Gallium Nitride Amplifiers with Exceptional Efficiency Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Achieving very high-power amplification with maximum efficiency at X- and Ka-band is challenging using solid-state technology. Gallium Arsenide (GaAs) has been the...

  12. A Photonic 1 × 4 Power Splitter Based on Multimode Interference in Silicon–Gallium-Nitride Slot Waveguide Structures

    Directory of Open Access Journals (Sweden)

    Dror Malka

    2016-06-01

    Full Text Available In this paper, a design for a 1 × 4 optical power splitter based on the multimode interference (MMI coupler in a silicon (Si–gallium nitride (GaN slot waveguide structure is presented—to our knowledge, for the first time. Si and GaN were found as suitable materials for the slot waveguide structure. Numerical optimizations were carried out on the device parameters using the full vectorial-beam propagation method (FV-BPM. Simulation results show that the proposed device can be useful to divide optical signal energy uniformly in the C-band range (1530–1565 nm into four output ports with low insertion losses (0.07 dB.

  13. Investigation of a Simplified Mechanism Model for Prediction of Gallium Nitride Thin Film Growth through Numerical Analysis

    Directory of Open Access Journals (Sweden)

    Chih-Kai Hu

    2017-03-01

    Full Text Available A numerical procedure was performed to simplify the complicated mechanism of an epitaxial thin-film growth process. In this study, three numerical mechanism models are presented for verifying the growth rate of the gallium nitride (GaN mechanism. The mechanism models were developed through rate of production analysis. All of the results can be compared in one schematic diagram, and the differences among these three mechanisms are pronounced at high temperatures. The simplified reaction mechanisms were then used as input for a two-dimensional computational fluid dynamics code FLUENT, enabling the accurate prediction of growth rates. Validation studies are presented for two types of laboratory-scale reactors (vertical and horizontal. A computational study including thermal and flow field was also performed to investigate the fluid dynamic in those reactors. For each study, the predictions agree acceptably well with the experimental data, indicating the reasonable accuracy of the reaction mechanisms.

  14. A Photonic 1 × 4 Power Splitter Based on Multimode Interference in Silicon–Gallium-Nitride Slot Waveguide Structures

    Science.gov (United States)

    Malka, Dror; Danan, Yossef; Ramon, Yehonatan; Zalevsky, Zeev

    2016-01-01

    In this paper, a design for a 1 × 4 optical power splitter based on the multimode interference (MMI) coupler in a silicon (Si)–gallium nitride (GaN) slot waveguide structure is presented—to our knowledge, for the first time. Si and GaN were found as suitable materials for the slot waveguide structure. Numerical optimizations were carried out on the device parameters using the full vectorial-beam propagation method (FV-BPM). Simulation results show that the proposed device can be useful to divide optical signal energy uniformly in the C-band range (1530–1565 nm) into four output ports with low insertion losses (0.07 dB). PMID:28773638

  15. Gallium nitride nanorod arrays as low-refractive-index transparent media in the entire visible spectral region.

    Science.gov (United States)

    Chen, Hung-Ying; Lin, Hon-Way; Wu, Chen-Ying; Chen, Wei-Chun; Chen, Jyh-Shin; Gwo, Shangjr

    2008-05-26

    Vertically aligned gallium nitride (GaN) nanorod arrays grown by the catalyst-free, self-organized method based on plasma-assisted molecular-beam epitaxy are shown to behave as subwavelength optical media with low effective refractive indices. In the reflection spectra measured in the entire visible spectral region, strong reflectivity modulations are observed for all nanorod arrays, which are attributed to the effects of Fabry-Pérot microcavities formed within the nanorod arrays by the optically flat air/nanorods and nanorods/substrate interfaces. By analyzing the reflectivity interference fringes, we can quantitatively determine the refractive indices of GaN nanorod arrays as functions of light wavelength. We also propose a model for understanding the optical properties of GaN nanorod arrays in the transparent region. Using this model, good numerical fitting can be achieved for the reflectivity spectra.

  16. Electrically driven, phosphor-free, white light-emitting diodes using gallium nitride-based double concentric truncated pyramid structures

    Institute of Scientific and Technical Information of China (English)

    Seung-Hyuk Lim; Young-Ho Ko; Christophe Rodriguez; Su-Hyun Gong; Yong-Hoon Cho

    2016-01-01

    White light-emitting diodes (LEDs) are becoming an alternative general light source,with huge energy savings compared to conventional lighting.However,white LEDs using phosphor(s) suffer from unavoidable Stokes energy converting losses,higher manufacturing cost,and reduced thermal stability.Here,we demonstrate electrically driven,phosphor-free,white LEDs based on three-dimensional gallium nitride structures with double concentric truncated hexagonal pyramids.The electroluminescence spectra are stable with varying current.The origin of the emission wavelength is studied by cathodoluminescence and high-angle annular dark field scanning transmission electron microscopy experiments.Spatial variation of the carrier injection efficiency is also investigated by a comparative analysis between spatially resolved photoluminescence and electroluminescence.

  17. The Growth of Gallium Nitride Films via the Innovative Technique of Atomic Layer Epitaxy

    Science.gov (United States)

    1989-06-01

    6 3.2 Aluminum Nitride and AIN/GaN Layered Structures ............ 8 3.3 Boron Nitride and BGaN Graded...of tearing in lower left region, indirectly indicating the presence of multiple layers of BGaN ............................... 14 12. Auger electron...electron spectroscopy sputtered depth profile of a BN/ BGaN /GaN/P-SiC film. Note peak in nitrogen trace as interface of BN is passed

  18. High Quality, Low Cost Bulk Gallium Nitride Substrates Grown by the Electrochemical Solution Growth Method

    Energy Technology Data Exchange (ETDEWEB)

    Seacrist, Michael [SunEdison Inc., St. Peters, MO (United States)

    2017-08-15

    The objective of this project was to develop the Electrochemical Solution Growth (ESG) method conceived / patented at Sandia National Laboratory into a commercially viable bulk gallium nitride (GaN) growth process that can be scaled to low cost, high quality, and large area GaN wafer substrate manufacturing. The goal was to advance the ESG growth technology by demonstrating rotating seed growth at the lab scale and then transitioning process to prototype commercial system, while validating the GaN material and electronic / optical device quality. The desired outcome of the project is a prototype commercial process for US-based manufacturing of high quality, large area, and lower cost GaN substrates that can drive widespread deployment of energy efficient GaN-based power electronic and optical devices. In year 1 of the project (Sept 2012 – Dec 2013) the overall objective was to demonstrate crystalline GaN growth > 100um on a GaN seed crystal. The development plan included tasks to demonstrate and implement a method for purifying reagent grade salts, develop the reactor 1 process for rotating seed Electrochemical Solution Growth (ESG) of GaN, grow and characterize ESG GaN films, develop a fluid flow and reaction chemistry model for GaN film growth, and design / build an improved growth reactor capable of scaling to 50mm seed diameter. The first year’s project objectives were met in some task areas including salt purification, film characterization, modeling, and reactor 2 design / fabrication. However, the key project objective of the growth of a crystalline GaN film on the seed template was not achieved. Amorphous film growth on the order of a few tenths of a micron has been detected with a film composition including Ga and N, plus several other impurities originating from the process solution and hardware. The presence of these impurities, particularly the oxygen, has inhibited the demonstration of crystalline GaN film growth on the seed template. However, the

  19. Characterization and Reliability of Vertical N-Type Gallium Nitride Schottky Contacts

    Science.gov (United States)

    2016-09-01

    fabricating ultra-pure, large diameter Si wafers has enabled rapid advancement in military technologies and consumer electronics; however, material...difference between the metal work function φM and the semiconductor electron affinity χ equals the Schottky barrier height φB : . (12...bandgap of GaN, approximately 3.3 eV, plus the electron affinity , approximately 1.5 eV. Second, the solubility of metals into gallium was taken into

  20. Preparation of gallium nitride surfaces for atomic layer deposition of aluminum oxide.

    Science.gov (United States)

    Kerr, A J; Chagarov, E; Gu, S; Kaufman-Osborn, T; Madisetti, S; Wu, J; Asbeck, P M; Oktyabrsky, S; Kummel, A C

    2014-09-14

    A combined wet and dry cleaning process for GaN(0001) has been investigated with XPS and DFT-MD modeling to determine the molecular-level mechanisms for cleaning and the subsequent nucleation of gate oxide atomic layer deposition (ALD). In situ XPS studies show that for the wet sulfur treatment on GaN(0001), sulfur desorbs at room temperature in vacuum prior to gate oxide deposition. Angle resolved depth profiling XPS post-ALD deposition shows that the a-Al2O3 gate oxide bonds directly to the GaN substrate leaving both the gallium surface atoms and the oxide interfacial atoms with XPS chemical shifts consistent with bulk-like charge. These results are in agreement with DFT calculations that predict the oxide/GaN(0001) interface will have bulk-like charges and a low density of band gap states. This passivation is consistent with the oxide restoring the surface gallium atoms to tetrahedral bonding by eliminating the gallium empty dangling bonds on bulk terminated GaN(0001).

  1. Epitaxial growth of III-V nitrides and phase separation and ordering in indium gallium nitride alloys

    Science.gov (United States)

    Doppalapudi, Dharanipal

    The family of III-V nitrides are wide band-gap semiconductors with a broad range of opto-electronic applications in LEDs, laser diodes, UV detectors as well as high temperature/high frequency devices. Due to the lack of good quality native substrates, GaN is grown on foreign substrates that have a lattice and thermal mismatch with GaN. This results in a material with a high density of defects, which in turn adversely affects the opto-electronic properties of the epilayer. In this study, GaN films were epitaxially grown on various substrates (C-plane sapphire, A-plane sapphire, SiC and ZnO) by molecular beam epitaxy. Additionally, GaN homoepitaxy onto laterally overgrown thick GaN substrates was investigated. It was demonstrated that the polarity of the GaN film plays a major role in determining the properties of the films. The growth parameters were optimized to eliminate inversion domain boundaries, which result in domains of opposite polarity in the GaN lattice. For growth on A-plane sapphire, it was found that substrate nitridation and low temperature buffer deposition are critical in order to obtain good epitaxial growth, in spite of the relatively small mismatch between the film and substrate. A crystallographic model was developed to explain this observation. By optimizing growth parameters, GaN films with excellent structural, transport, optical and device properties were grown. The second part of this research involves growth of ternary alloys and superlattice structures, which are essential in the fabrication of many devices. It was found that the InN-GaN pseudo-binary system is not homogeneous over the entire composition range. Due to the mismatch between the tetrahedral radii of GaN and InN, InGaN alloys exhibited phase separation and long-range atomic ordering. Investigations of InxGa1-xN films grown over a wide range of compositions by XRD and TEM showed that the predominant strain relieving mechanism was phase separation in films with x > 0.2, and

  2. Magnetostrictive iron gallium thin films grown onto antiferromagnetic manganese nitride: Structure and magnetism

    Science.gov (United States)

    Mandru, Andrada-Oana; Corbett, Joseph P.; Richard, Andrea L.; Gallagher, James; Meng, Keng-Yuan; Ingram, David C.; Yang, Fengyuan; Smith, Arthur R.

    2016-10-01

    We report structural and magnetic properties of magnetostrictive Fe100 -xGax (x ≈ 15) alloys when deposited onto antiferromagnetic manganese nitride and non-magnetic magnesium oxide substrates. From X-ray diffraction measurements, we find that the FeGa films are single crystalline. Scanning tunneling microscopy imaging reveals that the surface morphologies are dictated by the growth temperature, composition, and substrate. The magnetic properties can be tailored by the substrate, as found by magnetic force microscopy imaging and vibrating sample magnetometry measurements. In addition to pronounced tetragonal deformations, depositing FeGa onto manganese nitride leads to the formation of stripe-like magnetic domain patterns and to the appearance of perpendicular magnetic anisotropy.

  3. Indium gallium nitride-based ultraviolet, blue, and green light-emitting diodes functionalized with shallow periodic hole patterns.

    Science.gov (United States)

    Jeong, Hyun; Salas-Montiel, Rafael; Lerondel, Gilles; Jeong, Mun Seok

    2017-04-04

    In this study, we investigated the improvement in the light output power of indium gallium nitride (InGaN)-based ultraviolet (UV), blue, and green light-emitting diodes (LEDs) by fabricating shallow periodic hole patterns (PHPs) on the LED surface through laser interference lithography and inductively coupled plasma etching. Noticeably, different enhancements were observed in the light output powers of the UV, blue, and green LEDs with negligible changes in the electrical properties in the light output power versus current and current versus voltage curves. In addition, confocal scanning electroluminescence microscopy is employed to verify the correlation between the enhancement in the light output power of the LEDs with PHPs and carrier localization of InGaN/GaN multiple quantum wells. Light propagation through the PHPs on the UV, blue, and green LEDs is simulated using a three-dimensional finite-difference time-domain method to confirm the experimental results. Finally, we suggest optimal conditions of PHPs for improving the light output power of InGaN LEDs based on the experimental and theoretical results.

  4. Numerical Simulation on Electrical-Thermal Properties of Gallium-Nitride-Based Light-Emitting Diodes Embedded in Board

    Directory of Open Access Journals (Sweden)

    Xing-ming Long

    2012-01-01

    Full Text Available The electrical-thermal characteristics of gallium-nitride- (GaN- based light-emitting diodes (LED, packaged by chips embedded in board (EIB technology, were investigated using a multiphysics and multiscale finite element code, COMSOL. Three-dimensional (3D finite element model for packaging structure has been developed and optimized with forward-voltage-based junction temperatures of a 9-chip EIB sample. The sensitivity analysis of the simulation model has been conducted to estimate the current and temperature distribution changes in EIB LED as the blue LED chip (substrate, indium tin oxide (ITO, packaging structure (bonding wire and chip numbers, and system condition (injection current changed. This method proved the reliability of simulated results in advance and useful material parameters. Furthermore, the method suggests that the parameter match on Shockley's equation parameters, Rs, nideal, and Is, is a potential method to reduce the current crowding effect for the EIB LED. Junction temperature decreases by approximately 3 K to 10 K can be achieved by substrate thinning, ITO, and wire bonding. The nonlinear-decreasing characteristics of total thermal resistance that decrease with an increase in chip numbers are likely to improve the thermal performance of EIB LED modules.

  5. Current status and scope of gallium nitride-based vertical transistors for high-power electronics application

    Science.gov (United States)

    Chowdhury, Srabanti; Swenson, Brian L.; Hoi Wong, Man; Mishra, Umesh K.

    2013-07-01

    Gallium nitride (GaN) is becoming the material of choice for power electronics to enable the roadmap of increasing power density by simultaneously enabling high-power conversion efficiency and reduced form factor. This is because the low switching losses of GaN enable high-frequency operation which reduces bulky passive components with negligible change in efficiency. Commercialization of GaN-on-Si materials for power electronics has led to the entry of GaN devices into the medium-power market since the performance-over-cost of even first-generation products looks very attractive compared to today's mature Si-based solutions. On the other hand, the high-power market still remains unaddressed by lateral GaN devices. The current and voltage demand for high-power conversion application makes the chip area in a lateral topology so large that it becomes difficult to manufacture. Vertical GaN devices would play a big role alongside silicon carbide (SiC) to address the high-power conversion needs. In this paper vertical GaN devices are discussed with emphasis on current aperture vertical electron transistors (CAVETs) which have shown promising performance. The fabrication-related challenges and the future possibilities enabled by the availability of good-quality, cost-competitive bulk GaN material are also evaluated for CAVETs. This work was done at Department of Electrical and Computer Engineering, University of California, Santa Barbara, CA 93106, USA.

  6. Gallium nitride induces neuronal differentiation markers in neural stem/precursor cells derived from rat cerebral cortex.

    Science.gov (United States)

    Chen, Chi-Ruei; Li, Yi-Chen; Young, Tai-Horng

    2009-09-01

    In the present study, gallium nitride (GaN) was used as a substrate to culture neural stem/precursor cells (NSPCs), isolated from embryonic rat cerebral cortex, to examine the effect of GaN on the behavior of NSPCs in the presence of basic fibroblast growth factor (bFGF) in serum-free medium. Morphological studies showed that neurospheres maintained their initial shape and formed many long and thick processes with the fasciculate feature on GaN. Immunocytochemical characterization showed that GaN could induce the differentiation of NSPCs into neurons and astrocytes. Compared to poly-d-lysine (PDL), the most common substrate used for culturing neurons, there was considerable expression of synapsin I for differentiated neurons on GaN, suggesting GaN could induce the differentiation of NSPCs towards the mature differentiated neurons. Western blot analysis showed that the suppression of glycogen synthase kinase-3beta (GSK-3beta) activity was one of the effects of GaN-promoted NSPC differentiation into neurons. Finally, compared to PDL, GaN could significantly improve cell survival to reduce cell death after long-term culture. These results suggest that GaN potentially has a combination of electric characteristics suitable for developing neuron and/or NSPC chip systems.

  7. Application of gallium nitride nanostructures and nitrogen doped carbon spheres as supports for the hydrogenation of cinnamaldehyde.

    Science.gov (United States)

    Kente, Thobeka; Dube, Sibongile M A; Coville, Neil J; Mhlanga, Sabelo D

    2013-07-01

    This paper reports on the synthesis and use of nanostructures of gallium nitride (GaN NSs) and nitrogen doped carbon spheres (NCSs) as support materials for the hydrogenation of cinnamaldehyde. This study provides the first investigation of GaN as a catalyst support in hydrogenation reactions. The GaN NSs were synthesized via chemical vapour deposition (CVD) in a double stage furnace (750 degrees C) while NCSs were made by CVD in a single stage furnace (950 degrees C) respectively. TEM analysis revealed that the GaN NSs were rod-like with average diameters of 200 nm, while the NCSs were solid with smoother surfaces, and with diameters of 450 nm. Pd nanoparticles (1 and 3% loadings) were uniformly dispersed on acid functionalized GaN NSs and NCS. The Pd nanoparticles had average diameters that were influenced by the type of support material used. The GaN NSs and NCSs were tested for the selective hydrogenation of cinnamaldehyde in isopropanol at 40 and 60 degrees C under atmospheric pressure. A comparative study of the activity of the nanostructured materials revealed that the order of catalyst activity was 3% Pd/GaN > 3% Pd/NCSs > 1% Pd/NCSs > 1% Pd/GaN. However, 100% selectivity to hydrocinnamaldehyde (HCALD) was obtained with 1% Pd/GaN at reasonable conversion rates.

  8. Optimized Spiral Metal-Gallium-Nitride Nanowire Cavity for Ultra-High Circular Dichroism Ultraviolet Lasing at Room Temperature.

    Science.gov (United States)

    Liao, Wei-Chun; Liao, Shu-Wei; Chen, Kuo-Ju; Hsiao, Yu-Hao; Chang, Shu-Wei; Kuo, Hao-Chung; Shih, Min-Hsiung

    2016-05-25

    Circularly polarized laser sources with small footprints and high efficiencies can possess advanced functionalities in optical communication and biophotonic integrated systems. However, the conventional lasers with additional circular-polarization converters are bulky and hardly compatible with nanophotonic circuits, and most active chiral plasmonic nanostructures nowadays exhibit broadband emission and low circular dichroism. In this work, with spirals of gallium nitride (GaN) nanowires (NWRs) covered by a metal layer, we demonstrated an ultrasmall semiconductor laser capable of emitting circularly-polarized photons. The left- and right-hand spiral metal nanowire cavities with varied periods were designed at ultraviolet wavelengths to achieve the high quality factor circular dichroism metastructures. The dissymmetry factors characterizing the degrees of circular polarizations of the left- and right-hand chiral lasers were 1.4 and -1.6 (±2 if perfectly circular polarized), respectively. The results show that the chiral cavities with only 5 spiral periods can achieve lasing signals with the high degrees of circular polarizations.

  9. Indium gallium nitride-based ultraviolet, blue, and green light-emitting diodes functionalized with shallow periodic hole patterns

    Science.gov (United States)

    Jeong, Hyun; Salas-Montiel, Rafael; Lerondel, Gilles; Jeong, Mun Seok

    2017-04-01

    In this study, we investigated the improvement in the light output power of indium gallium nitride (InGaN)-based ultraviolet (UV), blue, and green light-emitting diodes (LEDs) by fabricating shallow periodic hole patterns (PHPs) on the LED surface through laser interference lithography and inductively coupled plasma etching. Noticeably, different enhancements were observed in the light output powers of the UV, blue, and green LEDs with negligible changes in the electrical properties in the light output power versus current and current versus voltage curves. In addition, confocal scanning electroluminescence microscopy is employed to verify the correlation between the enhancement in the light output power of the LEDs with PHPs and carrier localization of InGaN/GaN multiple quantum wells. Light propagation through the PHPs on the UV, blue, and green LEDs is simulated using a three-dimensional finite-difference time-domain method to confirm the experimental results. Finally, we suggest optimal conditions of PHPs for improving the light output power of InGaN LEDs based on the experimental and theoretical results.

  10. Wet chemical functionalization of III-V semiconductor surfaces: alkylation of gallium arsenide and gallium nitride by a Grignard reaction sequence.

    Science.gov (United States)

    Peczonczyk, Sabrina L; Mukherjee, Jhindan; Carim, Azhar I; Maldonado, Stephen

    2012-03-13

    Crystalline gallium arsenide (GaAs) (111)A and gallium nitride (GaN) (0001) surfaces have been functionalized with alkyl groups via a sequential wet chemical chlorine activation, Grignard reaction process. For GaAs(111)A, etching in HCl in diethyl ether effected both oxide removal and surface-bound Cl. X-ray photoelectron (XP) spectra demonstrated selective surface chlorination after exposure to 2 M HCl in diethyl ether for freshly etched GaAs(111)A but not GaAs(111)B surfaces. GaN(0001) surfaces exposed to PCl(5) in chlorobenzene showed reproducible XP spectroscopic evidence for Cl-termination. The Cl-activated GaAs(111)A and GaN(0001) surfaces were both reactive toward alkyl Grignard reagents, with pronounced decreases in detectable Cl signal as measured by XP spectroscopy. Sessile contact angle measurements between water and GaAs(111)A interfaces after various levels of treatment showed that GaAs(111)A surfaces became significantly more hydrophobic following reaction with C(n)H(2n-1)MgCl (n = 1, 2, 4, 8, 14, 18). High-resolution As 3d XP spectra taken at various times during prolonged direct exposure to ambient lab air indicated that the resistance of GaAs(111)A to surface oxidation was greatly enhanced after reaction with Grignard reagents. GaAs(111)A surfaces terminated with C(18)H(37) groups were also used in Schottky heterojunctions with Hg. These heterojunctions exhibited better stability over repeated cycling than heterojunctions based on GaAs(111)A modified with C(18)H(37)S groups. Raman spectra were separately collected that suggested electronic passivation by surficial Ga-C bonds at GaAs(111)A. Specifically, GaAs(111)A surfaces reacted with alkyl Grignard reagents exhibited Raman signatures comparable to those of samples treated with 10% Na(2)S in tert-butanol. For GaN(0001), high-resolution C 1s spectra exhibited the characteristic low binding energy shoulder demonstrative of surface Ga-C bonds following reaction with CH(3)MgCl. In addition, 4

  11. Low-energy ion beam-based deposition of gallium nitride

    Energy Technology Data Exchange (ETDEWEB)

    Vasquez, M. R., E-mail: mrvasquez@coe.upd.edu.ph [Department of Mining, Metallurgical, and Materials Engineering, College of Engineering, University of the Philippines, Diliman, Quezon City 1101 (Philippines); Wada, M. [Graduate School of Science and Engineering, Doshisha University, Kyotanabe, Kyoto 610-0321 (Japan)

    2016-02-15

    An ion source with a remote plasma chamber excited by a 13.56 MHz radio frequency power was used for low-energy broad ion beam extraction. Optical emission spectral analyses showed the sputtering and postionization of a liquid gallium (Ga) target placed in a chamber separated from the source bombarded by argon (Ar) plasma guided by a bent magnetic field. In addition, an E × B probe successfully showed the extraction of low-energy Ga and Ar ion beams using a dual-electrode extractor configuration. By introducing dilute amounts of nitrogen gas into the system, formation of thin Ga-based films on a silicon substrate was demonstrated as determined from X-ray diffraction and X-ray reflectivity studies.

  12. Low-energy ion beam-based deposition of gallium nitride.

    Science.gov (United States)

    Vasquez, M R; Wada, M

    2016-02-01

    An ion source with a remote plasma chamber excited by a 13.56 MHz radio frequency power was used for low-energy broad ion beam extraction. Optical emission spectral analyses showed the sputtering and postionization of a liquid gallium (Ga) target placed in a chamber separated from the source bombarded by argon (Ar) plasma guided by a bent magnetic field. In addition, an E × B probe successfully showed the extraction of low-energy Ga and Ar ion beams using a dual-electrode extractor configuration. By introducing dilute amounts of nitrogen gas into the system, formation of thin Ga-based films on a silicon substrate was demonstrated as determined from X-ray diffraction and X-ray reflectivity studies.

  13. Theoretical study of gallium nitride molecules, GaN2 and GaN4.

    Science.gov (United States)

    Tzeli, Demeter; Theodorakopoulos, Giannoula; Petsalakis, Ioannis D

    2008-09-18

    The electronic and geometric structures of gallium dinitride GaN 2, and gallium tetranitride molecules, GaN 4, were systematically studied by employing density functional theory and perturbation theory (MP2, MP4) in conjunction with the aug-cc-pVTZ basis set. In addition, for the ground-state of GaN 4( (2)B 1) a density functional theory study was carried out combining different functionals with different basis sets. A total of 7 minima have been identified for GaN 2, while 37 structures were identified for GaN 4 corresponding to minima, transition states, and saddle points. We report geometries and dissociation energies for all the above structures as well as potential energy profiles, potential energy surfaces and bonding mechanisms for some low-lying electronic states of GaN 4. The dissociation energy of the ground-state GaN 2 ( X (2)Pi) is 1.1 kcal/mol with respect to Ga( (2)P) + N 2( X (1)Sigma g (+)). The ground-state and the first two excited minima of GaN 4 are of (2)B 1( C 2 v ), (2)A 1( C 2 v , five member ring), and (4)Sigma g (-)( D infinityh ) symmetry, respectively. The dissociation energy ( D e) of the ground-state of GaN 4, X (2)B 1, with respect to Ga( (2)P) + 2 N 2( X (1)Sigma g (+)), is 2.4 kcal/mol, whereas the D e of (4)Sigma g (-) with respect to Ga( (4)P) + 2 N 2( X (1)Sigma g (+)) is 17.6 kcal/mol.

  14. Surface and interface properties of polar gallium nitride layers; Oberflaechen- und Grenzflaecheneigenschaften von polaren Galliumnitrid-Schichten

    Energy Technology Data Exchange (ETDEWEB)

    Lorenz, Pierre

    2010-07-09

    The material properties of group III-nitrides allows manifold applications. Especially for the GaN-based gas and biosensor technology, an understanding of the GaN surfaces and their interaction with molecules is crucial for the successful development of sensor systems. Especially the influence of crystal orientation, surface termination and reconstruction on the interaction was analysed. To study the interaction of the GaN surface with molecules the reproducible and controllable preparation of GaN surfaces is necessary. Polar GaN layers were grown by molecular beam epitaxy. The surface reconstruction and termination could be selectively adjusted by the growth parameters or further preparation steps. On the Ga-polar surface, gallium-induced and nitrogen-induced 2 x 2 reconstructed as well as non-reconstructed surface modifications could be generated and on the N-polar surface non-reconstructed. The different surface modifications differ considerably in the formation of surface states. The Ga-induced and N-induced 2 x 2 reconstructed surfaces presented two surface states (SS) at 1.4 eV and 3 eV as well as 2 eV and 3 eV, respectively. The non-reconstructed GaN(0001) presented three SS (1.5 eV, 2.5 eV and 3.4 eV) and the GaN(000-1) one SS (2.5 eV). The theoretical predicted surfaces sates (density functional theory) shows a good agreement with the measurements. The analysis revealed a dependence of the interaction of GaN surfaces with O{sub 2} and H{sub 2}O on the orientation, reconstruction, and surface termination of the films. The GaN(000-1) surface is much more reactive to oxygen and water than the (0001) orientated surfaces, while GaN is in general significantly more sensitive to water than to oxygen. The chemical bond configuration of the adsorbed species shows a significant dependence on surface termination. The measurements presented that the formation of nitrogen oxide and/or gallium oxide bonds depends on the surface modification. Furthermore the interaction

  15. Thermal Conductivity of Wurtzite Zinc-Oxide from First-Principles Lattice Dynamics--a Comparative Study with Gallium Nitride.

    Science.gov (United States)

    Wu, Xufei; Lee, Jonghoon; Varshney, Vikas; Wohlwend, Jennifer L; Roy, Ajit K; Luo, Tengfei

    2016-03-01

    Wurtzite Zinc-Oxide (w-ZnO) is a wide bandgap semiconductor that holds promise in power electronics applications, where heat dissipation is of critical importance. However, large discrepancies exist in the literature on the thermal conductivity of w-ZnO. In this paper, we determine the thermal conductivity of w-ZnO using first-principles lattice dynamics and compare it to that of wurtzite Gallium-Nitride (w-GaN)--another important wide bandgap semiconductor with the same crystal structure and similar atomic masses as w-ZnO. However, the thermal conductivity values show large differences (400 W/mK of w-GaN vs. 50 W/mK of w-ZnO at room temperature). It is found that the much lower thermal conductivity of ZnO originates from the smaller phonon group velocities, larger three-phonon scattering phase space and larger anharmonicity. Compared to w-GaN, w-ZnO has a smaller frequency gap in phonon dispersion, which is responsible for the stronger anharmonic phonon scattering, and the weaker interatomic bonds in w-ZnO leads to smaller phonon group velocities. The thermal conductivity of w-ZnO also shows strong size effect with nano-sized grains or structures. The results from this work help identify the cause of large discrepancies in w-ZnO thermal conductivity and will provide in-depth understanding of phonon dynamics for the design of w-ZnO-based electronics.

  16. Characterization of in-depth cavity distribution after thermal annealing of helium-implanted silicon and gallium nitride

    Energy Technology Data Exchange (ETDEWEB)

    Fodor, B., E-mail: fodor.balint@ttk.mta.hu [Institute for Technical Physics and Materials Science, Research Centre for Natural Sciences (MTA TTK MFA), 1121 Budapest, Konkoly Thege u. 29-33 (Hungary); Faculty of Science, University of Pécs, 7624 Pécs, Ifjúság útja 6 (Hungary); Cayrel, F. [GREMAN, pôle MTECH, Université François Rabelais, 16 rue Pierre et Marie Curie, B.P. 7155, F37071 Tours Cedex (France); Agocs, E. [Institute for Technical Physics and Materials Science, Research Centre for Natural Sciences (MTA TTK MFA), 1121 Budapest, Konkoly Thege u. 29-33 (Hungary); Doctoral School of Molecular- and Nanotechnologies, Faculty of Information Technology, University of Pannonia, Egyetem u. 10, Veszprem 8200 (Hungary); Alquier, D. [GREMAN, pôle MTECH, Université François Rabelais, 16 rue Pierre et Marie Curie, B.P. 7155, F37071 Tours Cedex (France); Fried, M.; Petrik, P. [Institute for Technical Physics and Materials Science, Research Centre for Natural Sciences (MTA TTK MFA), 1121 Budapest, Konkoly Thege u. 29-33 (Hungary); Doctoral School of Molecular- and Nanotechnologies, Faculty of Information Technology, University of Pannonia, Egyetem u. 10, Veszprem 8200 (Hungary)

    2014-11-28

    Single-crystalline silicon wafers covered with sacrificial oxide layer and epitaxially grown gallium nitride layers were implanted with high-fluence helium ions (2–6 × 10{sup 16} cm{sup −2}) at energies of 20–30 keV. Thermal annealings at 650–1000 °C, 1 h were performed on the Si samples and rapid thermal annealings at 600–1000 °C, 120 s under N{sub 2} were performed on the GaN samples. The as-implanted samples and the near-surface cavity distributions of the annealed samples were investigated with variable angle spectroscopic ellipsometry. In-depth defect profiles and cavity profiles can be best described with multiple independent effective medium sublayers of varying ratio of single-crystal/void. The number of sublayers was chosen to maximize the fit quality without a high parameter cross-correlation. The dependence of the implantation fluence, oxide layer thickness and annealing temperature on the cavity distribution was separately investigated. The ellipsometric fitted distributions were compared and cross-checked with analyses of transmission electron micrographs where the average surface cavity was determined sublayer by sublayer. The in-depth profiles were also compared with simulations of He and vacancy distributions. - Highlights: • He implanted and annealed Si and GaN measured by spectroscopic ellipsometry • Effective medium approximation models developed • Cavity formation as function of oxide thickness, ion dose, annealing temperature • Cavity in-depth distributions compared with transmission electron micrographs.

  17. High sensitivity hydrogen sensing with Pt-decorated porous gallium nitride prepared by metal-assisted electroless etching.

    Science.gov (United States)

    Duan, Barrett K; Bohn, Paul W

    2010-05-01

    A unique hydrogen sensor structure based on Pt-decorated porous gallium nitride (PGaN) was fabricated by a two-step process consisting of metal-assisted electroless etching to produce PGaN with highly anisotropic pores followed by electroless deposition of Pt in the pores from an ammoniacal PtCl(6)(2-) solution. The Pt-decorated PGaN structure contains 50-100 nm diameter nanopores which are 400 nm to 1 microm deep and filled with Pt islands. Both electroless etching and deposition steps are done in solution and allow for large-scale production. An AC four-point probe conductivity measurement was implemented at f = 1 kHz, a frequency where the impedance of Pt-PGaN is nearly entirely resistive, and the change in conductance upon H(2) exposure was measured for three sample types: PGaN with a surface sputtered layer of Pt only; unetched GaN (CGaN) with both sputtered and electrolessly deposited Pt; and PGaN with both sputtered and electrolessly deposited Pt. The hydrogen sensing performance of the Pt-filled PGaN sensor was more than an order of magnitude better than either of the other two sample types under all experimental conditions, an observation attributed to the significant increase in Pt-GaN interfacial area in the electrolessly decorated PGaN samples, exhibiting a response to H2 concentrations as low as 1 ppm. The conductance changes are ascribed to adsorption-induced changes in interfacial polarization that produce changes in band bending and thus to the width of the space charge region near the Pt-GaN interface.

  18. Variation of crystallinity and stoichiometry in films of gallium oxide, gallium nitride and barium zirconate prepared by means of PLD; Variation von Kristallinitaet und Stoechiometrie in mittels PLD hergestellten Schichten aus Galliumoxid, Galliumnitrid und Bariumzirkonat

    Energy Technology Data Exchange (ETDEWEB)

    Brendt, Jochen

    2011-08-05

    Pulsed Laser Deposition (PLD) is an ablation technique for thin film preparation of many materials. The film properties can be well controlled by the process parameters. Therefore, in many cases a given material can be deposited with different properties by changing one or more process parameters. In this thesis thin films of gallium oxide, gallium nitride and barium zirconate were deposited with a large variation in structure and stoichiometry by means of Pulsed Laser Deposition. The characterization of the film crystallinity, phase purity and short range structural order was completed by means of X-ray diffraction and X-ray absorption spectroscopy. The stoichiometry was investigated using electron probe microanalysis. For analyzing the correlation between the structure and stoichiometry with the optical and electrical properties, optical absorption and electrical conductivity measurements were carried out. The investigation of all three material systems showed that very unique properties can be realized when combining an amorphous structure and a non-stoichiometric composition. For example, in amorphous and oxygen deficient gallium oxide an insulator-metal-transition can be induced by partial crystallization of the as prepared phase accomplished by annealing at about 400 C in argon atmosphere (as shown in literature). Furthermore, amorphous and highly non-stoichiometric barium zirconate has the ability to split water molecules to hydrogen and oxygen at room temperature. A detailed analysis of both phenomena has been performed by means of photoemission and transmission electron microscopy in the case of gallium oxide and via X-ray absorption spectroscopy and gas chromatography in the case of barium zirconate.

  19. Low Damage, High Anisotropy Inductively Coupled Plasma for Gallium Nitride based Devices

    KAUST Repository

    Ibrahim, Youssef H.

    2013-05-27

    Group III-nitride semiconductors possess unique properties, which make them versatile materials for suiting many applications. Structuring vertical and exceptionally smooth GaN profiles is crucial for efficient optical device operation. The processing requirements for laser devices and ridge waveguides are stringent as compared to LEDs and other electronic devices. Due to the strong bonding and chemically inert nature of GaN, dry etching becomes a critical fabrication step. The surface morphology and facet etch angle are analyzed using SEM and AFM measurements. The influence of different mask materials is also studied including Ni as well as a SiO2 and resist bilayer. The high selectivity Ni Mask is found to produce high sidewall angles ~79°. Processing parameters are optimized for both the mask material and GaN in order to achieve a highly anisotropic, smooth profile, without resorting to additional surface treatment steps. An optimizing a SF6/O2 plasma etch process resulted in smooth SiO2 mask sidewalls. The etch rate and GaN surface roughness dependence on the RF power was also examined. Under a low 2mTorr pressure, the RF and ICP power were optimized to 150W and 300W respectively, such that a smooth GaN morphology and sidewalls was achieved with reduced ion damage. The The AFM measurements of the etched GaN surface indicate a low RMS roughness ranging from 4.75 nm to 7.66 nm.

  20. Strain compensated superlattices on m-plane gallium nitride by ammonia molecular beam epitaxy

    Science.gov (United States)

    Fireman, Micha N.; Bonef, Bastien; Young, Erin C.; Nookala, Nishant; Belkin, Mikhail A.; Speck, James S.

    2017-08-01

    The results of tensile strained AlN/GaN, AlGaN/GaN, and compressive strained InGaN/GaN superlattices (SLs) grown by Ammonia MBE (NH3-MBE) are presented. A combination of atom probe tomography and high-resolution X-ray diffraction confirms that periodic heterostructures of high crystallographic quality are achieved. Strain induced misfit dislocations (MDs), however, are revealed by cathodoluminescence (CL) of the strained AlN/GaN, AlGaN/GaN, and InGaN/GaN structures. MDs in the active region of a device are a severe problem as they act as non-radiative charge recombination centers, affecting the reliability and efficiency of the device. Strain compensated SL structures are subsequently developed, composed of alternating layers of tensile strained AlGaN and compressively strained InGaN. CL reveals the absence of MDs in such structures, demonstrating that strain compensation offers a viable route towards MD free active regions in III-Nitride SL based devices.

  1. Q-Band (45 GHz) Microwave Integrated Circuit Power Amplifier Designs Submitted to TriQuint Semiconductor for Fabrication with 0.15-micron High-Electron-Mobility Transistors (HEMT) Using 2-mil Gallium Nitride (GaN) on Silicon Carbide (SiC)

    Science.gov (United States)

    2013-09-01

    Electron-Mobility Transistors (HEMT) Using 2-mil Gallium Nitride (GaN) on Silicon Carbide (SiC) by John E. Penn ARL-TN-0574 September 2013...µm High-Electron-Mobility Transistors (HEMT) Using 2-mil Gallium Nitride (GaN) on Silicon Carbide (SiC) John E. Penn Sensors and Electron Devices...with 0.15-µm High- Electron-Mobility Transistors (HEMT) Using 2-mil Gallium Nitride (GaN) on Silicon Carbide (SiC) 5a. CONTRACT NUMBER 5b. GRANT

  2. Selective excitation of the yellow and blue luminescence in n- and p-doped Gallium Nitride

    CERN Document Server

    Colton, J S

    2000-01-01

    doping-related potential fluctuations and disorder. Characteristics of the our model for the BL include (a) an Urbach tail, having width E sub 0 = 33 meV, (b) a strong electron-LO phonon coupling occurring with a Frank-Condon shift of approx 180 meV between excitation and emission, (c) a mobility gap at 2.8 eV, separating highly mobile states and highly localized states, and (d) PL-like behavior for excitation energies larger than 2.8 eV, having a blue-shift with increasing excitation energy caused by the increased number of free carriers in the material. GaN is an interesting material: technologically very useful, but still having many unexplained features. Two such features are the broad defect-related luminescence bands: the YL of n-type GaN and the BL of Mg-doped p-type GaN. We have employed selective excitation to investigate these bands. In the case of the YL, most of the previous evidence has supported a recombination model between distant donors and acceptors, most likely a transition involving a shal...

  3. Selective excitation of the yellow and blue luminescence in n- and p-doped Gallium Nitride

    Energy Technology Data Exchange (ETDEWEB)

    Colton, John Synder [Univ. of California, Berkeley, CA (United States)

    2000-12-01

    GaN is an interesting material: technologically very useful, but still having many unexplained features. Two such features are the broad defect-related luminescence bands: the YL of n-type GaN and the BL of Mg-doped p-type GaN. We have employed selective excitation to investigate these bands. In the case of the YL, most of the previous evidence has supported a recombination model between distant donors and acceptors, most likely a transition involving a shallow donor to a deep acceptor. Our selective excitation experiments have resolved finer structures within the YL. Our results indicate that the YL in bulk samples is related to the YL in film samples. We suggest that selectively excited YL involves recombination at DAP complexes, rather than between spatially distant DAPs (however other recombination channels, including that of distant DAPs may become significant under other excitation conditions). Characteristics of the DAP complexes within our YL model include (a) an electron localization energy of around 60-70 meV, (b) a localized phonon energy of around 40 meV, and (c) excited states of the complex at 200 and 370 meV above the ground state. In the case of the BL, the deep defect responsible for the BL is unknown, and there may not even be a deep defect involved. Also in dispute is the role of potential fluctuations in the properties of the BL. Our results have been explain in a model whereby emission is from DAPs, and significant effects are produced by doping-related potential fluctuations and disorder. Characteristics of the our model for the BL include (a) an Urbach tail, having width E{sub 0} = 33 meV, (b) a strong electron-LO phonon coupling occurring with a Frank-Condon shift of {approx} 180 meV between excitation and emission, (c) a mobility gap at 2.8 eV, separating highly mobile states and highly localized states, and (d) PL-like behavior for excitation energies larger than 2.8 eV, having a blue-shift with increasing excitation energy caused by the

  4. Evaluation of the indium gallium nitride/silicon broken-gap heterojunction and its potential application for solar cells

    Science.gov (United States)

    Yao, Yuan

    InGaN (especially In-rich alloy) has been actively studied for decades since the band gap of InN was revised downward from ˜2.0 eV to 0.64 eV. The potential applications for alloys of In-rich InGaN hence became apparent. Despite the promising potential, photovoltaic devices based on InGaN have struggled due to a number of key limitations and fundamental physical problems. Firstly, due to the deep excursion of the InN conduction band at the gamma point, defects in InN are almost universally n-type leading to unintentional degenerate doping. This also leads to the problem of electron accumulation at all surfaces and interfaces of InN. Secondly, p-type doping is problematic, partially due to the degenerate doping effect of defects, but it has also been observed that Mg-doping, while leading to a p-type layer, dramatically reduces the quantum efficiency. This thesis explores an alternative approach using n-type InGaN to form a heterojunction with a p-type Si substrate. One potential benefit to using p-type Si as a substrate material for InGaN is that the valence band of Si possibly lines up with the conduction band of InGaN for a specific mole fraction of indium. Such a band alignment is known as a broken gap heterojunction, an example of which is the interface between InAs and AlxGa 1--xSb. The benefits of this broken-gap junction include a low series resistance, high electron mobility, and mobility only weakly dependent on temperature. These properties enable new approach to photovoltaic devices. The InGaN/Si heterojunctions were fabricated by plasma-assisted molecular beam epitaxy under stoichiometric flux conditions. An ultra-thin SiN interface layer was introduced, by Si nitridation process, to passivate the substrate surface and prevent In-Si and Ga-Si eutectic problems. InGaN films with a variety of indium mole fractions were grown by calibrating the In/Ga flux ratio during the deposition. The chemical composition of as-grown films was characterized by x

  5. MQWs InGaN/GaN LED with embedded micro-mirror array in the epitaxial-lateral-overgrowth gallium nitride for light extraction enhancement.

    Science.gov (United States)

    Huang, Chen-Yang; Ku, Hao-Min; Liao, Chen-Zi; Chao, Shiuh

    2010-05-10

    Multi-quantum wells (MQWs) InGaN/GaN LEDs, 300 microm x 300 microm chip size, were fabricated with Ta(2)O(5) / SiO(2) dielectric multi-layer micro-mirror array (MMA) embedded in the epitaxiallateral- overgrowth (ELOG) gallium nitride (GaN) on the c-plane sapphire substrate. MQWs InGaN/GaN LEDs with ELOG embedded patterned SiO(2) array (P-SiO(2)) of the same dimension as the MMA were also fabricated for comparison. Dislocation density was reduced for the ELOG samples. 75.2% light extraction enhancement for P-SiO(2)-LED and 102.6% light extraction enhancement for MMA-LED were obtained over the standard LED. We showed that multiple-diffraction with high intensity from the MMA redirected the trap lights to escape from the LED causing the light extraction enhancement.

  6. A modification of Eu incorporation sites by the dissociation of hydrogen defect complexes in Mg co-doped Eu doped gallium nitride

    Science.gov (United States)

    Mitchell, Brandon; Poplawsky, Jonathan; Dierolf, Volkmar

    2013-03-01

    Europium doped gallium nitride (Eu:GaN) is a promising candidate as a material for red LEDs that can monolithically be integrated with existing nitride based lighting technology. Photoluminescence (PL) and cathodoluminescence (CL) studies have revealed, however, that the majority incorporation environment (site) for the Eu is not efficiently excited by electron hole pairs. To improve this efficiency, Mg was co-doped into Eu:GaN during metal organic chemical vapor deposition and multiple new incorporation environments were discovered. These new sites show a high efficiency at room temperature and have been attributed to the coupling of a Mg-H complex to the majority Eu site. However, we also observe that sustained electron beam irradiation produced a semi-permanent change in the CL spectra of the sample. It was demonstrated that this change occurs in two distinct steps which exhibit a pronounced temperature dependence. Our observations point toward a dynamic system in which the Mg-H bond is broken and the hydrogen moves within the epi-layer. Details of this behavior will be discussed.

  7. Solvothermal synthesis: a new route for preparing nitrides

    CERN Document Server

    Demazeau, G; Denis, A; Largeteau, A

    2002-01-01

    Solvothermal synthesis appears to be an interesting route for preparing nitrides such as gallium nitride and aluminium nitride, using ammonia as solvent. A nitriding additive is used to perform the reaction and, in the case of gallium nitride, is encapsulated by melt gallium. The syntheses are performed in the temperature range 400-800 deg. C and in the pressure range 100-200 MPa. The synthesized powders are characterized by x-ray diffraction and scanning electron microscopy. Finely divided gallium nitride GaN and aluminium nitride AlN, both with wurtzite-type structure, can be obtained by this route.

  8. Formation of Gallium Nitride Crystal Loops on Silicon (111) Substrate%Si(111)衬底上生长GaN晶环的研究

    Institute of Scientific and Technical Information of China (English)

    王显明; 孙振翠; 魏芹芹; 王强; 曹文田; 薛成山

    2004-01-01

    利用热壁化学气相沉积在Si(111)衬底上获得GaN晶环,采用扫描电镜(SEM)、选择区电子衍射(SAED)、X射线衍射(XRD),光致发光(PL)谱和傅里叶红外吸收谱(FTIR)对晶环的组成、结构、形貌和光学特性进行分析.初步结果证明:在Si(111)衬底上获得择优生长的六方纤锌矿结构的GaN晶环.SEM显示在均匀的薄膜上出现直径约为10μm的5晶环,由XRD和SAED的分析证实晶环呈六方纤矿多晶结构,FTIR显示GaN薄膜的主要成分为GaN,同时含有少量的C污染,PL测试表明晶环呈现不同于GaN薄膜的发光特性.%The crystal loops of Gallium nitride (GaN) were deposited on silicon (111) substrate by using hot-wall chemical vapor deposition and thermal treatment. Scanning electron microscopy (SEM), selected area electron diffraction (SAED), x-ray diffraction (XRD), photoluminescence (PL) and Fourier Transform Infrared transmission (FTIR) Spectroscopy were employed to analyze the surface morphology, structure and optical properties of GaN layer.SEM image shows five half-loops attached to a crystal string side by side in the uniform films. XRD, SAED patterns reveal that the formed loops are polycrystalline hexagonal gallium nitride. FTIR pattern shows the main composition of the film is GaN and it contains trifle carbon contamination. New feature is found in PL pattern of the crystal loops,which is different from the bulk GaN films.

  9. Gallium vacancy complexes as a cause of Shockley-Read-Hall recombination in III-nitride light emitters

    Science.gov (United States)

    Dreyer, Cyrus E.; Alkauskas, Audrius; Lyons, John L.; Speck, James S.; Van de Walle, Chris G.

    2016-04-01

    We describe a mechanism by which complexes between gallium vacancies and oxygen and/or hydrogen act as efficient channels for nonradiative recombination in InGaN alloys. Our identification is based on first-principles calculations of defect formation energies, charge-state transition levels, and nonradiative capture coefficients for electrons and holes. The dependence of these quantities on alloy composition is analyzed. We find that modest concentrations of the proposed defect complexes (˜1016 cm-3) can give rise to Shockley-Read-Hall coefficients A =(107-109) s-1. The resulting nonradiative recombination would significantly reduce the internal quantum efficiency of optoelectronic devices.

  10. Effect of nitrogen doping on the structural, optical and electrical properties of indium tin oxide films prepared by magnetron sputtering for gallium nitride light emitting diodes

    Science.gov (United States)

    Tian, Lifei; Cheng, Guoan; Wang, Hougong; Wu, Yulong; Zheng, Ruiting; Ding, Peijun

    2017-01-01

    The indium tin oxide (ITO) films are prepared by the direct current magnetron sputtering technology with an ITO target in a mixture of argon and nitrogen gas at room temperature. The blue transmittance at 455 nm rises from 63% to 83% after nitrogen doping. The resistivity of the ITO film reduces from 4.6 × 10-3 (undoped film) to 5.7 × 10-4 Ω cm (N-doped film). The X-ray photoelectron spectroscopy data imply that the binding energy of the In3d5/2 peak is declined 0.05 eV after nitrogen doping. The high resolution transmission electron microscope images show that the nitrogen loss density of the GaN/ITO interface with N-doped ITO film is smaller than that of the GaN/ITO interface with undoped ITO film. The forward turn-on voltage of gallium nitride light emitting diode reduces by 0.5 V after nitrogen doping. The fabrication of the N-doped ITO film is conducive to modify the N component of the interface between GaN and ITO layer.

  11. Effects of post-deposition annealing ambient on band alignment of RF magnetron-sputtered Y2O3 film on gallium nitride.

    Science.gov (United States)

    Quah, Hock Jin; Cheong, Kuan Yew

    2013-01-29

    The effects of different post-deposition annealing ambients (oxygen, argon, forming gas (95% N2 + 5% H2), and nitrogen) on radio frequency magnetron-sputtered yttrium oxide (Y2O3) films on n-type gallium nitride (GaN) substrate were studied in this work. X-ray photoelectron spectroscopy was utilized to extract the bandgap of Y2O3 and interfacial layer as well as establishing the energy band alignment of Y2O3/interfacial layer/GaN structure. Three different structures of energy band alignment were obtained, and the change of band alignment influenced leakage current density-electrical breakdown field characteristics of the samples subjected to different post-deposition annealing ambients. Of these investigated samples, ability of the sample annealed in O2 ambient to withstand the highest electric breakdown field (approximately 6.6 MV/cm) at 10-6 A/cm2 was related to the largest conduction band offset of interfacial layer/GaN (3.77 eV) and barrier height (3.72 eV).

  12. Resonant and nonresonant vibrational excitation of ammonia molecules in the growth of gallium nitride using laser-assisted metal organic chemical vapour deposition

    Science.gov (United States)

    Golgir, Hossein Rabiee; Zhou, Yun Shen; Li, Dawei; Keramatnejad, Kamran; Xiong, Wei; Wang, Mengmeng; Jiang, Li Jia; Huang, Xi; Jiang, Lan; Silvain, Jean Francois; Lu, Yong Feng

    2016-09-01

    The influence of exciting ammonia (NH3) molecular vibration in the growth of gallium nitride (GaN) was investigated by using an infrared laser-assisted metal organic chemical vapor deposition method. A wavelength tunable CO2 laser was used to selectively excite the individual vibrational modes. Resonantly exciting the NH-wagging mode (v2) of NH3 molecules at 9.219 μm led to a GaN growth rate of 84 μm/h, which is much higher than the reported results. The difference between the resonantly excited and conventional thermally populated vibrational states was studied via resonant and nonresonant vibrational excitations of NH3 molecules. Resonant excitation of various vibrational modes was achieved at 9.219, 10.35, and 10.719 μm, respectively. Nonresonant excitation was conducted at 9.201 and 10.591 μm, similar to conventional thermal heating. Compared to nonresonant excitation, resonant excitation noticeably promotes the GaN growth rate and crystalline quality. The full width at half maximum value of the XRD rocking curves of the GaN (0002) and GaN (10-12) diffraction peaks decreased at resonant depositions and reached its minimum value of 45 and 53 arcmin, respectively, at the laser wavelength of 9.219 μm. According to the optical emission spectroscopic studies, resonantly exciting the NH3 v2 mode leads to NH3 decomposition at room temperature, reduces the formation of the TMGa:NH3 adduct, promotes the supply of active species in GaN formation, and, therefore, results in the increased GaN growth rate.

  13. Enhanced current transport and injection in thin-film gallium-nitride light-emitting diodes by laser-based doping.

    Science.gov (United States)

    Kim, Su Jin; Kim, Kyeong Heon; Chung, Ho Young; Shin, Hee Woong; Lee, Byeong Ryong; Jeong, Tak; Park, Hyung Jo; Kim, Tae Geun

    2014-10-08

    This paper reports improvements in the electrical and optical properties of blue-emission gallium nitride (GaN)-based thin-film light-emitting diodes (TFLEDs) after laser-based Si doping (LBSD) of a nitrogen-face n-GaN (denoted as hereafter n-GaN) layer. Experimental results show that the light-output powers of the flat- and rough-surface TFLEDs after LBSD are 52.1 and 11.35% higher than those before LBSD, respectively, at a current of 350 mA, while the corresponding operating voltages are decreased by 0.22 and 0.28 V for the flat- and rough-surface TFLEDs after LBSD, respectively. The reduced operating voltage after LBSD of the top n-GaN layer may result from the remarkably decreased specific contact resistance at the metal/n-GaN interface and the low series resistance of the TFLED device. The LBSD of n-GaN increases the number of nitrogen vacancies, and Si substitutes for Ga (SiGa) at the metal/n-GaN interface to produce highly Si-doped regions in n-GaN, leading to a decrease in the Schottky barrier height and width. As a result, the specific contact resistances are significantly decreased to 1.56 × 10(-5) and 2.86 × 10(-5) Ω cm(2) for the flat- and rough-surface samples after LBSD, respectively. On the other hand, the increased light-output power after LBSD can be explained by the uniform current spreading, efficient current injection, and enhanced light scattering resulting from the low contact resistivity, low lateral current resistance, and additional textured surface, respectively. Furthermore, LBSD did not degrade the electrical properties of the TFLEDs owing to low reverse leakage currents. The results indicate that our approach could potentially enable high-efficiency and high-power capabilities for optoelectronic devices.

  14. Si(111)衬底上生长GaN晶绳的研究%Formation of gallium nitride crystal string on silicon (111) substrate

    Institute of Scientific and Technical Information of China (English)

    曹文田; 孙振翠; 魏芹芹; 薛成山; 王强

    2003-01-01

    利用热壁化学气相沉积在Si(111)衬底上获得GaN晶绳,采用傅里叶红外吸收谱(FTIR)、扫描电子显微镜(SEM)、选区电子衍射(SAED)、X射线衍射(XRD)和光致发光谱(PL)对晶绳进行组成、结构、形貌和光学特性分析.初步结果证明:在Si(111)衬底上获得择优生长的六方纤锌矿结构的GaN晶绳.SEM显示在均匀的薄膜上出现6μm的晶绳,FTIR显示GaN薄膜的主要成分为GaN同时含有少量的C污染,由XRD和SAED的综合分析得出晶绳呈六方纤锌矿单晶结构,PL测试表明晶绳呈现不同于GaN薄膜的发光特性.%GaN crystal string was deposited on Si (111) substrate by hot- wall chemical vapor depo- sition. Fourier Transform Infrared Transmission (FTIR) Spectroscopy, Scanning Electron Microscopy (SEM), Selected Area Electron Diffraction (SAED), X- Ray Diffraction (XRD) and Photoluminescence (PL) spectroscopy were employed to analyze the composition, surface morphology, structure, and optical property of GaN layer. FTIR pattern shows the main composition of the film is GaN and it contains trifle carbon contamination. SEM images show a crystal string with a diameter of 6μ m appears in the uniform film. XRD, SAED patterns reveal that the formed string is single- crystalline hexagonal gallium nitride. New feature is found in PL pattern of the crystal string, which is different from the bulk GaN films.

  15. Nanopipe formation as a result of boron impurity segregation in gallium nitride grown by halogen-free vapor phase epitaxy

    Science.gov (United States)

    Kimura, Taishi; Aoki, Yuko; Horibuchi, Kayo; Nakamura, Daisuke

    2016-12-01

    The work reported herein demonstrated that nanopipes can be formed via a surfactant effect, in which boron impurities preferentially migrate to semipolar and nonpolar facets. Approximately 3 μm-thick GaN layers were grown using halogen-free vapor phase epitaxy. All layers grown in pyrolytic boron nitride (pBN) crucibles were found to contain a high density of nanopipes in the range of 1010 to 1011 cm-2. The structural properties of these nanopipes were analyzed by X-ray rocking curve measurements, transmission electron microscopy, and three-dimensional atom probe (3DAP) tomography. The resulting 3DAP maps showed nanopipe-sized regions of boron segregation, and these nanopipes were not associated with the presence of dislocations. A mechanism for nanopipe formation was developed based on the role of boron as a surfactant and considering energy minima. A drastic reduction in the nanopipe density was achieved upon replacing the pBN crucibles with tantalum carbide-coated carbon crucibles. Consequently, we have confirmed that nanopipes can be formed solely due to surface energy changes induced by boron impurity surface segregation. For this reason, these results also indicate that nanopipes should be formed by other surfactant impurities such as Mg and Si.

  16. Synthesis of Gallium Nitride Nanowire Bundles Using Carbon Nanotubes as Template%基于碳纳米管模板的氮化镓纳米线束合成

    Institute of Scientific and Technical Information of China (English)

    严晗; 刘胜; 甘志银; 宋晓辉; 徐静平

    2009-01-01

    通过金属有机物化学气相沉积方法在碳纳米管模板上生长氮化镓纳米线束.对所生长的纳米结构进行了扫描电镜和X射线能谱分析,结果显示氮化镓纳米晶体可以与碳纳米管形成纳米线束状复合物.纳米线柬状复合物直径为100~200 nm,长度为1.5~2.5 μm,纳米线的两端呈现尖角状.由于氨气很容易吸附在碳纳米管表面.可知所获得的纳米结构的初始生长机制为碳纳米管的表面氮化.该研究也证明金属有机物化学气相沉积将是用于制造化合物纳米结构材料的一项有效的技术.%Template growth of gallium nitride nanowires was demonstrated by metal organic chemical va-por deposition (MOCVD) with carbon nanotubes as templates in this paper. The fabricated nanostruc-tures were characterized by scanning electron microscopy (SEM) and energy dispersive X-ray spectrosco-py (EDX). The results reveal that gallium nitride nanocrystals are grown on carbon nanotubes in the form of composite nanowire bundles. The composite nanowire bundles are 100-200 nm thick with typical lengths of 1.5-2.5 μm, while there is a shape with a slight tapering toward the tip of the wire. The growth mechanism of the obtained nanostructures is initiated by nitridation of carbon nanotube surfaces, due to the fact that ammonia is easily adsorbed on carbon nanotube surface. MOCVD is also suggested to be an effective technology for the fabrication of compound nanostructure material in the future.

  17. High K Oxide Insulated Gate Group III Nitride-Based FETs

    Science.gov (United States)

    2014-03-21

    the physical and electrical properties of high-k dielectric oxides on gallium nitride were explored. The efficacies of several cleaning procedures...surface roughening. Parameters examined included the oxide composition (AI203, Ti02, and Ga203), the gallium nitride crystallographic orientation (c...and m-plane), and its crystal polarity (Ga- anc N-polar). 15. SUBJECT TERMS Gallium nitride , oxides, atomic layer deposition, capitance-voltage

  18. Synthesis of ternary metal nitride nanoparticles using mesoporous carbon nitride as reactive template.

    Science.gov (United States)

    Fischer, Anna; Müller, Jens Oliver; Antonietti, Markus; Thomas, Arne

    2008-12-23

    Mesoporous graphitic carbon nitride was used as both a nanoreactor and a reactant for the synthesis of ternary metal nitride nanoparticles. By infiltration of a mixture of two metal precursors into mesoporous carbon nitride, the pores act first as a nanoconfinement, generating amorphous mixed oxide nanoparticles. During heating and decomposition, the carbon nitride second acts as reactant or, more precisely, as a nitrogen source, which converts the preformed mixed oxide nanoparticles into the corresponding nitride (reactive templating). Using this approach, ternary metal nitride particles with diameters smaller 10 nm composed of aluminum gallium nitride (Al-Ga-N) and titanium vanadium nitride (Ti-V-N) were synthesized. Due to the confinement effect of the carbon nitride matrix, the composition of the resulting metal nitride can be easily adjusted by changing the concentration of the preceding precursor solution. Thus, ternary metal nitride nanoparticles with continuously adjustable metal composition can be produced.

  19. X-ray Photoelectron Spectroscopy Study to the Surface of p-type Gallium Nitride%P型氮化镓表面的X射线光电子能谱研究

    Institute of Scientific and Technical Information of China (English)

    许金通; 汤英文; 游达; 龚海梅; 李向阳; 赵德刚

    2005-01-01

    文章研究了P型氮化镓材料表面自然氧化,故意氧化以及盐酸处理等三种不同情况下的X射线光电子能谱(XPS).结果发现800℃下在空气中故意氧化6min后,P型氮化镓材料表面的镓(Ga2p3/2)峰出现较大移动,向高能端移动了0.88eV(与盐酸处理的样品相比),O1s峰向低能方向移动了0.9eV,且镓氮原子含量比最大;在空气中自然氧化和盐酸处理的两个样品峰的移动很小,各个峰的移动大约在0.1eV左右,但是用盐酸处理后的样品的含氧量有所下降,且盐酸处理的样品的镓氮原子含量比最小,镓氮的原子含量比小有利于形成镓空位,而镓空位是受主,这样镓氮原子含量比越小越有利于形成P型氮化镓欧姆接触.

  20. Development of gallium nitride-based ultraviolet and visible light-emitting diodes using hydride vapor-phase epitaxy and molecular beam epitaxy

    Science.gov (United States)

    Cabalu, Jasper Sicat

    Much of the work done on ultraviolet (UV) and visible III-Nitrides-based light emitting diodes (LEDs) involves growth by metal-organic chemical vapor deposition (MOCVD). In this dissertation, the growth, development, and fabrication of III-Nitrides-based UV and visible LEDs with very high photon conversion and extraction efficiencies using hydride vapor-phase epitaxy (HVPE) and radio frequency (rf) plasma-assisted molecular beam epitaxy (PAMBE) is presented. High-power electrically-pumped UV-LEDs based on GaN/AlGaN multiple quantum wells (MQWs) emitting at 340 nm and 350 nm have been fabricated in a flip-chip configuration and evaluated. Under pulsed operation, UV-LEDs emitting at 340 nm have output powers that saturate, due to device heating, at approximately 3 mW. Devices emitting at 350 nm show DC operation output powers as high as 4.5 mW under 200 mA drive current. These results were found to be equivalent with those of UV-LEDs produced by the MOCVD and HVPE methods. The concept of using textured MQWs on UV-LED structures was tested by optical pumping of GaN/AlGaN MQWs grown on textured GaN templates. Results show highly enhanced (>700 times) blue-shifted photoluminescence (PL) at 360 nm compared to similarly produced MQWs on smooth GaN templates whose PL emission is red-shifted. These results are attributed partly to enhancement in light extraction efficiency (LEE) and partly to enhancement in internal quantum efficiency (IQE). The origin of the increase in IQE is partly due to reduction of the quantum-confined Stark effect (QCSE) on QW-planes not perpendicular to the polarization direction and partly due to charge redistribution in the QWs caused by the polarization component parallel to the planes of the QWs. Similar studies have been done for visible LEDs using InGaN/GaN MQWs. Growth of LED structures on textured GaN templates employing textured MQW-active regions resulted in the production of dichromatic (430 nm and 530 nm) phosphorless white LEDs with

  1. A Study of Strain States of Gallium Nitride Prepared Through Solid-State Metathesis Reaction Under High Pressure and High Temperature.%高温高压固态复分解反应法生长氮化镓的应变性质研究

    Institute of Scientific and Technical Information of China (English)

    马瑶; 龚敏; 马欢; 贺端威

    2011-01-01

    本文采用高温高压下固态复分解反应法生长氮化镓.用X射线衍射仪、扫描电子显微镜、激光拉曼光谱仪对其进行分析,结果表明生成了六角纤锌矿结构的氮化镓晶体.该样品在宏观上受到了张应力的作用,退火后,宏观的应变状态由张应变向压应变转变;晶体微观应力减小,晶粒尺寸变大,晶体质量变好.%Gallium nitride(GaN) crystals have been prepared through solid-state metathesis reaction under high pressure and high temperature. X-ray diffraction(XRD) ..Scanning e-lectron microscopy(SEM)and Raman spectra (Raman) were used to analyse the crystals. The results indicated that the crystals were hexagonal Gallium nitride and its macrostress was tensile. After anneal, the strain states of the crystals changed from tensile to com-pressive. And the microstress reduced? The size increased and the quality became better.

  2. High performance gallium nitride based blue light emitting diode material epitaxy and dry etching fabrication technology%氮化镓基高亮度发光二极管材料外延和干法刻蚀技术

    Institute of Scientific and Technical Information of China (English)

    罗毅; 邵嘉平; 郭文平; 韩彦军; 胡卉; 薛松; 孙长征; 郝智彪

    2004-01-01

    通过对氮化镓(Gallium nitride,GaN)基蓝色高亮度发光二极管(High brightness light emitting diode,HB-LED)材料金属有机气相外延(Metal organic vapor phase epitaxy,MOVPE)生长技术的研究和优化以及在有源区内引入新型InxGa1-xN/GaN多量子阱(Multiple quantum wells,MQWs)结构,获得了高性能的HB-LED外延片材料.高分辨率X射线衍射(High resolution X-ray diffraction,HR-XRD)和变温光致荧光谱(Temperature dependent photoluminescence spectra,TD-PL Spectra)测量表明外延材料的异质界面陡峭,单晶质量优异,并由变注入电致荧光谱(Injection dependent electroluminescence spectra,ID-EL spectra)测量获得:HB-LED芯片的峰值发光波长在注入电流为2 mA至120 mA变化下蓝移量小于1 nm,电致荧光谱的半高全宽值(Full width hlf maximum,FWHM)在注入电流为20 mA时仅为18 nm.此外,还介绍了GaN基材料感应耦合等离子体(Inductivelycoupled plasma,ICP)干法刻蚀技术.考虑实际需要,本文作者开发了AlGaN/GaN异质材料的非选择性刻蚀工艺,原子力显微镜(Atomic force microscope,AFM)观察得到AlGaN/GaN刻蚀表面均方根粗糙度RMS仅为0.85nm,与外延片的表面平整度相当.还获得了AlGaN/GaN高选择比的刻蚀技术,GaN和AlGaN的刻蚀选择比为60.

  3. First-Principles Study of Structural and Electronic Properties of Chromium Nitride/Gallium Nitride Multilayer (CrN/GaN Estudio por primeros principios de las propiedades estructurales y electrónicas de la multicapa CrN/GaN

    Directory of Open Access Journals (Sweden)

    Ricardo Eulises Báez Cruz

    2013-03-01

    Full Text Available In this work we perform first-principles calculations to investigate the structural and electronic properties of the 1x1 CrN/GaN multilayer. The calculations were executed in zincblende and wurtzite phase, since they are the ground states of chromium nitride CrN and gallium nitride GaN, respectively. However, we study the stability of the multilayer in the NaCl phase, in order to predict possible phase transitions. We found that the most favorable phase for the multilayer is the hexagonal wurtzite type, with possibility of passing to the NaCl phase by applying an external pressure. Our calculations indicate that the pressure of transition is 13,5 GPa. From the density of states, we found that the multilayer present a metallic behavior produced by the hybrid orbitals d-Cr and N-p that cross level Fermi.En este trabajo realizamos cálculos de primeros principios para investigar las propiedades estructurales y electrónicas de la multicapa 1x1 CrN/GaN. Los cálculos se realizan en las fases zincblenda y wurtzita, debido a que este es el estado base del nitruro de cromo CrN y el nitruro de galio GaN, respectivamente. Sin embargo, se estudia la estabilidad de la multicapa en la fase NaCl, con el fin predecir posibles transiciones de fase. Encontramos que la fase más favorable para multicapa, es la hexagonal tipo wurtzita, con posibilidad de pasar a la fase NaCl mediante la aplicación de una presión externa. Nuestros cálculos nos permiten predecir que la presión de transición es 13,5 GPa. A partir de la densidad de estados encontramos que la multicapa posee un comportamiento metálico debido a la hibridación de los orbitales Cr-d y N-p que atraviesan el nivel de Fermi.

  4. Lung gallium scan

    Science.gov (United States)

    Gallium 67 lung scan; Lung scan; Gallium scan - lung; Scan - lung ... Gallium is injected into a vein. The scan will be taken 6 to 24 hours after the gallium is injected. (Test time depends on whether your condition is acute or chronic .) ...

  5. Technology of gallium nitride crystal growth

    CERN Document Server

    Ehrentraut, Dirk; Bockowski, Michal

    2010-01-01

    This book deals with the important technological aspects of the growth of GaN single crystals by HVPE, MOCVD, ammonothermal and flux methods for the purpose of free-standing GaN wafer production. Leading experts from industry and academia report in a very comprehensive way on the current state-of-the-art of the growth technologies and optical and structural properties of the GaN crystals are compared.

  6. Growth of single-crystal gallium nitride

    Science.gov (United States)

    Clough, R.; Richman, D.; Tietjen, J.

    1970-01-01

    Use of ultrahigh purity ammonia prevents oxygen contamination of GaN during growth, making it possible to grow the GaN at temperatures as high as 825 degrees C, at which point single crystal wafers are deposited on /0001/-oriented sapphire surfaces.

  7. New applications advisable for gallium nitride

    Directory of Open Access Journals (Sweden)

    S.J. Pearton

    2002-06-01

    The explosive increase of interest in the AlGaInN family of materials in recent years has been fueled by the application of blue/green/UV light-emitting diodes (LEDs in full-color displays, traffic lights, automotive lighting, and general room lighting (using so-called white LEDs1. In addition, blue/green laser diodes can be used in high storage-capacity digital versatile disk (DVD systems2. AlGaN-based photodetectors are also useful for solar-blind UV detection and have applications as flame sensors for control of gas turbines or detection of missiles.

  8. Investigations in gallium removal

    Energy Technology Data Exchange (ETDEWEB)

    Philip, C.V.; Pitt, W.W. [Texas A and M Univ., College Station, TX (United States); Beard, C.A. [Amarillo National Resource Center for Plutonium, TX (United States)

    1997-11-01

    Gallium present in weapons plutonium must be removed before it can be used for the production of mixed-oxide (MOX) nuclear reactor fuel. The main goal of the preliminary studies conducted at Texas A and M University was to assist in the development of a thermal process to remove gallium from a gallium oxide/plutonium oxide matrix. This effort is being conducted in close consultation with the Los Alamos National Laboratory (LANL) personnel involved in the development of this process for the US Department of Energy (DOE). Simple experiments were performed on gallium oxide, and cerium-oxide/gallium-oxide mixtures, heated to temperatures ranging from 700--900 C in a reducing environment, and a method for collecting the gallium vapors under these conditions was demonstrated.

  9. Characterization and reliability of aluminum gallium nitride/gallium nitride high electron mobility transistors

    Science.gov (United States)

    Douglas, Erica Ann

    Compound semiconductor devices, particularly those based on GaN, have found significant use in military and civilian systems for both microwave and optoelectronic applications. Future uses in ultra-high power radar systems will require the use of GaN transistors operated at very high voltages, currents and temperatures. GaN-based high electron mobility transistors (HEMTs) have proven power handling capability that overshadows all other wide band gap semiconductor devices for high frequency and high-power applications. Little conclusive research has been reported in order to determine the dominating degradation mechanisms of the devices that result in failure under standard operating conditions in the field. Therefore, it is imperative that further reliability testing be carried out to determine the failure mechanisms present in GaN HEMTs in order to improve device performance, and thus further the ability for future technologies to be developed. In order to obtain a better understanding of the true reliability of AlGaN/GaN HEMTs and determine the MTTF under standard operating conditions, it is crucial to investigate the interaction effects between thermal and electrical degradation. This research spans device characterization, device reliability, and device simulation in order to obtain an all-encompassing picture of the device physics. Initially, finite element thermal simulations were performed to investigate the effect of device design on self-heating under high power operation. This was then followed by a study of reliability of HEMTs and other tests structures during high power dc operation. Test structures without Schottky contacts showed high stability as compared to HEMTs, indicating that degradation of the gate is the reason for permanent device degradation. High reverse bias of the gate has been shown to induce the inverse piezoelectric effect, resulting in a sharp increase in gate leakage current due to crack formation. The introduction of elevated temperatures during high reverse gate bias indicated that device failure is due to the breakdown of an unintentional gate oxide. RF stress of AlGaN/GaN HEMTs showed comparable critical voltage breakdown regime as that of similar devices stressed under dc conditions. Though RF device characteristics showed stability up to a drain bias of 20 V, Schottky diode characteristics degraded substantially at all voltages investigated. Results from both dc and RF stress conditions, under several bias regimes, confirm that the primary root for stress induced degradation was due to the Schottky contact. (Full text of this dissertation may be available via the University of Florida Libraries web site. Please check http://www.uflib.ufl.edu/etd.html)

  10. Two-Dimensional Modeling of Aluminum Gallium Nitride/Gallium Nitride High Electron Mobility Transistor

    Science.gov (United States)

    2002-06-01

    Binari, Dr. Mario Ancona, Dr. Weber, Dr. Specht, and Dr. Feick for beginning this valuable work. My parents, Ossie and Jewell Henry , for their love...33, No.14, pp. 1230-1231. 20. Petrosky , K.J., “High-Power High-Frequency SiC and GaN Devices for Microwave Amplifier Applications,” 12 March 2002

  11. Piezoresistance in p-type silicon revisited

    DEFF Research Database (Denmark)

    Richter, Jacob; Pedersen, Jesper; Brandbyge, Mads;

    2008-01-01

    We calculate the shear piezocoefficient pi44 in p-type Si with a 6×6 k·p Hamiltonian model using the Boltzmann transport equation in the relaxation-time approximation. Furthermore, we fabricate and characterize p-type silicon piezoresistors embedded in a (001) silicon substrate. We find that the ...

  12. Gallium Arsenide Photocathode Development

    Science.gov (United States)

    1975-10-01

    r ~\\ 1 1 AD-A018 619 ■ i I 1 GALLIUM ARSENIDE PHOTOCATHODE DEVELOPMENT I Terry Roach, et al 1 1 ■f EPSCO ...aiwiiwnHWlffl’Wip m, «swwerf^MW^S’ GALLIUM ARSENIDE PHOTOCATHODE DEVELOPMENT T. J. Roach Bianca Contractor: EPSCO Laboratories Contract Number: F08606...PHOTOCATHODE DEVELOPMENT 7. AUTHORfaJ T. Roach J. Bianca t. PERFORMING ORGANIZATION NAME AND AOORESS EPSCO Laboratories 227 High Ridge Road Stauford CT

  13. Photoconduction spectroscopy of p-type GaSb films

    Energy Technology Data Exchange (ETDEWEB)

    Shura, M.W., E-mail: Megersa.Shura@live.nmmu.ac.za [Department of Physics, P.O. Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031 (South Africa); Wagener, V.; Botha, J.R.; Wagener, M.C. [Department of Physics, P.O. Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031 (South Africa)

    2012-05-15

    Excess carrier lifetimes (77 K) have been measured as function of the absorbed flux density in undoped p-type gallium antimonide films (GaSb/GaAs) using steady state photoconductivity measurements with the illumination wavelength of 1.1 {mu}m. Using the results from Hall effect measurements along with the relations describing the lifetimes of the excess minority carriers in the bulk of the films and at the surface, the theoretical values of the effective excess carrier lifetime in the materials were also calculated. Discrepancies between the experimental and theoretical results were described using a two-layer model, by considering the variation in the charge distribution within the layer due to the presence of surface states, as well as the band offset between the layer and the substrate. Theoretical modeling of the experimental result yields values of different parameters such as band bending at the surface, minimum value of Shockley-Read-Hall lifetime and maximum value of the surface recombination velocity.

  14. Effect of Variation of Silicon Nitride Passivation Layer on Electron Irradiated Aluminum Gallium Nitride/Gallium Nitride HEMT Structures

    Science.gov (United States)

    2014-06-19

    dioxide for passivation. As early as the 1980s, use of a Si3N4 layer on silicon operational amplifiers to achieve 4 radiation resistant...resistance of a precision operational amplifier .” IEEE Transactions on Nuclear Science, 28, no. 6 (1981): 4325-27. Fagerlind, M., Allerstain, F...172 6.3. Transconductance and Diode Measurements .......................................... 181 6.4. Deep Level Transient

  15. Electrodeposition of gallium for photovoltaics

    Energy Technology Data Exchange (ETDEWEB)

    Bhattacharya, Raghu N.

    2016-08-09

    An electroplating solution and method for producing an electroplating solution containing a gallium salt, an ionic compound and a solvent that results in a gallium thin film that can be deposited on a substrate.

  16. Evolution of plant P-type ATPases

    Directory of Open Access Journals (Sweden)

    Christian N.S. Pedersen

    2012-02-01

    Full Text Available Five organisms having completely sequenced genomes and belonging to all major branches of green plants (Viridiplantae were analyzed with respect to their content of P-type ATPases encoding genes. These were the chlorophytes Ostreococcus tauria and Chlamydomonas reinhardtii, and the streptophytes Physcomitrella patens (a moss, Selaginella moellendorffii (a primitive vascular plant, and Arabidopsis thaliana (a model flowering plant. Each organism contained sequences for all five subfamilies of P-type ATPases. Our analysis demonstrates when specific subgroups of P-type ATPases disappeared in the evolution of Angiosperms. Na/K-pump related P2C ATPases were lost with the evolution of streptophytes whereas Na+ or K+ pumping P2D ATPases and secretory pathway Ca2+-ATPases remained until mosses. An N-terminally located calmodulin binding domain in P2B ATPases can only be detected in pumps from Streptophytae, whereas, like in animals, a C-terminally localized calmodulin binding domain might be present in chlorophyte P2B Ca2+-ATPases. Chlorophyte genomes encode P3A ATPases resembling protist plasma membrane H+-ATPases and a C-terminal regulatory domain is missing. The complete inventory of P-type ATPases in the major branches of Viridiplantae is an important starting point for elucidating the evolution in plants of these important pumps.

  17. X-ray Photoelectron Spectroscopy and Spectroscopic Ellipsometry Study of the Thermal Oxide on Gallium Nitride%GaN基热氧化物的XPS和椭偏光谱研究

    Institute of Scientific and Technical Information of China (English)

    杜江锋; 赵金霞; 于奇; 杨谟华

    2009-01-01

    The physical characteristics such as composition, thickness and optical constant of the oxide thin films are investigated by X-ray photoelectron spectrocopy (XPS) and spectroscopic ellipsometry (SE). XPS spectra of Ga_(3d) and O_(1s), core levels indicate that the thermal oxide is gallium oxide (Ga_2O_3) and the ratio of Ga to O is about 1.2 which is induced by the existence of much oxygen loss. SE metrical results indicate the linear grown rate is ~40nm/h and the average grown rate is ~25nm/h. The refractive index of Ga_2O_3 is 1.9~2.2 in the wavelength range of 300~800nm which agree with the previous study results. However, The anomalous refractive phenomenon appeares at 300~400nm, the reason is probably interrelated with the strong absorbance of GaN in this wavelength range and needs to study deeply in the future.%采用X射线光谱R(XPS)和椭偏测试仪(SE)对GaN材料干氧氧化所得氧化物薄膜的组分、厚度、光学常数等物理特性进行了研究.当氧化温度为900℃、氧化时间为15~240min时,XPS测试结果表明,所得氧化物类型为Ga_2O_3,且由于大量O空位的存在,其表面Ga/O比率约为1.2.SE测试结果表明,GaN线性氧化速率约为40nm/h,呈抛物线生长,最终平均氧化速率约为25nm/h.在300~800nm测试范围内,Ga_2O_3折射率为1.9~2.2,与文献测试结果相符.但在300~400nm测试范围内存在反常色散现象,这与GaN在此波段的强吸收有关.

  18. Group III-nitride thin films grown using MBE and bismuth

    Science.gov (United States)

    Kisielowski, Christian K.; Rubin, Michael

    2000-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  19. Hafnium nitride buffer layers for growth of GaN on silicon

    Science.gov (United States)

    Armitage, Robert D.; Weber, Eicke R.

    2005-08-16

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 {character pullout}m. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  20. Gallium-containing anticancer compounds

    OpenAIRE

    Chitambar, Christopher R.

    2012-01-01

    There is an ever pressing need to develop new drugs for the treatment of cancer. Gallium nitrate, a group IIIa metal salt, inhibits the proliferation of tumor cells in vitro and in vivo and has shown activity against non-Hodgkin’s lymphoma and bladder cancer in clinical trials. Gallium can function as an iron mimetic and perturb iron-dependent proliferation and other iron-related processes in tumor cells. Gallium nitrate lacks cross resistance with conventional chemotherapeutic drugs and is n...

  1. P-type transparent conducting oxides

    Science.gov (United States)

    Zhang, Kelvin H. L.; Xi, Kai; Blamire, Mark G.; Egdell, Russell G.

    2016-09-01

    Transparent conducting oxides constitute a unique class of materials combining properties of electrical conductivity and optical transparency in a single material. They are needed for a wide range of applications including solar cells, flat panel displays, touch screens, light emitting diodes and transparent electronics. Most of the commercially available TCOs are n-type, such as Sn doped In2O3, Al doped ZnO, and F doped SnO2. However, the development of efficient p-type TCOs remains an outstanding challenge. This challenge is thought to be due to the localized nature of the O 2p derived valence band which leads to difficulty in introducing shallow acceptors and large hole effective masses. In 1997 Hosono and co-workers (1997 Nature 389 939) proposed the concept of ‘chemical modulation of the valence band’ to mitigate this problem using hybridization of O 2p orbitals with close-shell Cu 3d 10 orbitals. This work has sparked tremendous interest in designing p-TCO materials together with deep understanding the underlying materials physics. In this article, we will provide a comprehensive review on traditional and recently emergent p-TCOs, including Cu+-based delafossites, layered oxychalcogenides, nd 6 spinel oxides, Cr3+-based oxides (3d 3) and post-transition metal oxides with lone pair state (ns 2). We will focus our discussions on the basic materials physics of these materials in terms of electronic structures, doping and defect properties for p-type conductivity and optical properties. Device applications based on p-TCOs for transparent p-n junctions will also be briefly discussed.

  2. Gallium--A smart metal

    Science.gov (United States)

    Foley, Nora; Jaskula, Brian W.

    2013-01-01

    Gallium is a soft, silvery metallic element with an atomic number of 31 and the chemical symbol Ga. The French chemist Paul-Emile Lecoq de Boisbaudran discovered gallium in sphalerite (a zinc-sulfide mineral) in 1875 using spectroscopy. He named the element "gallia" after his native land of France (formerly Gaul; in Latin, Gallia). The existence of gallium had been predicted in 1871 by Dmitri Mendeleev, the Russian chemist who published the first periodic table of the elements. Mendeleev noted a gap in his table and named the missing element "eka-aluminum" because he determined that its location was one place away from aluminum in the table. Mendeleev thought that the missing element (gallium) would be very much like aluminum in its chemical properties, and he was right. Solid gallium has a low melting temperature (~29 degrees Celsius, or °C) and an unusually high boiling point (~2,204 °C). Because of these properties, the earliest uses of gallium were in high-temperature thermometers and in designing metal alloys that melt easily. The development of a gallium-based direct band-gap semiconductor in the 1960s led to what is now one of the most well-known applications for gallium-based products--the manufacture of smartphones and data-centric networks.

  3. Estimations of the spontaneous polarization of binary and ternary compounds of group III nitrides

    Science.gov (United States)

    Davydov, S. Yu.; Posrednik, O. V.

    2016-04-01

    The dependences of spontaneous polarizations P sp of solid solutions of aluminum, gallium, and indium nitrides on the compositions were estimated using the Harrison bond-orbital method. A simple formula was proposed to estimate P sp using only lengths of the interatomic bonds between the nearest neighbor atoms and the angles between these bonds.

  4. Crystalline boron nitride aerogels

    Science.gov (United States)

    Zettl, Alexander K.; Rousseas, Michael; Goldstein, Anna P.; Mickelson, William; Worsley, Marcus A.; Woo, Leta

    2017-04-04

    This disclosure provides methods and materials related to boron nitride aerogels. In one aspect, a material comprises an aerogel comprising boron nitride. The boron nitride has an ordered crystalline structure. The ordered crystalline structure may include atomic layers of hexagonal boron nitride lying on top of one another, with atoms contained in a first layer being superimposed on atoms contained in a second layer.

  5. Crystalline boron nitride aerogels

    Energy Technology Data Exchange (ETDEWEB)

    Zettl, Alexander K.; Rousseas, Michael; Goldstein, Anna P.; Mickelson, William; Worsley, Marcus A.; Woo, Leta

    2017-04-04

    This disclosure provides methods and materials related to boron nitride aerogels. In one aspect, a material comprises an aerogel comprising boron nitride. The boron nitride has an ordered crystalline structure. The ordered crystalline structure may include atomic layers of hexagonal boron nitride lying on top of one another, with atoms contained in a first layer being superimposed on atoms contained in a second layer.

  6. Boron nitride composites

    Energy Technology Data Exchange (ETDEWEB)

    Kuntz, Joshua D.; Ellsworth, German F.; Swenson, Fritz J.; Allen, Patrick G.

    2017-02-21

    According to one embodiment, a composite product includes: a matrix material including hexagonal boron nitride and one or more borate binders; and a plurality of cubic boron nitride particles dispersed in the matrix material. According to another embodiment, a composite product includes: a matrix material including hexagonal boron nitride and amorphous boron nitride; and a plurality of cubic boron nitride particles dispersed in the matrix material.

  7. Plasma nitriding of steels

    CERN Document Server

    Aghajani, Hossein

    2017-01-01

    This book focuses on the effect of plasma nitriding on the properties of steels. Parameters of different grades of steels are considered, such as structural and constructional steels, stainless steels and tools steels. The reader will find within the text an introduction to nitriding treatment, the basis of plasma and its roll in nitriding. The authors also address the advantages and disadvantages of plasma nitriding in comparison with other nitriding methods. .

  8. Gallium Arsenide Domino Circuit

    Science.gov (United States)

    Yang, Long; Long, Stephen I.

    1990-01-01

    Advantages include reduced power and high speed. Experimental gallium arsenide field-effect-transistor (FET) domino circuit replicated in large numbers for use in dynamic-logic systems. Name of circuit denotes mode of operation, which logic signals propagate from each stage to next when successive stages operated at slightly staggered clock cycles, in manner reminiscent of dominoes falling in a row. Building block of domino circuit includes input, inverter, and level-shifting substages. Combinational logic executed in input substage. During low half of clock cycle, result of logic operation transmitted to following stage.

  9. Atomic scale piezo electricity and giant piezo electric resistance effect in gallium nitride tunnel junctions under compressive strain%压缩应变载荷下氮化镓隧道结微观压电特性及其巨压电电阻效应∗

    Institute of Scientific and Technical Information of China (English)

    张耿鸿; 朱佳; 姜格蕾; 王彪; 郑跃

    2016-01-01

    电子器件可控性研究在日益追求器件智能化和可控化的当今社会至关重要.基于第一性原理和量子输运计算,本文研究了压缩应变载荷对氮化镓(GaN)隧道结基态电学性质和电流输运的影响,在原子尺度上窥视了氮化镓隧道结的微观压电性,验证了其内在的巨压电电阻(GPR)效应.计算结果表明,压缩应变载荷可以调节隧道结内氮化镓势垒层的电势能降、内建电场、电荷密度和极化强度,进而实现对隧道结电流输运和隧穿电阻的调控.在−1.0 V的偏置电压下,−5%的压缩应变载荷将使氮化镓隧道结的隧穿电阻增至4倍.本研究展现了氮化镓隧道结在可控电子器件中的应用潜力,也展现了应变工程在调控电子器件性能方面的光明前景.%It is an urgent and significant issue to investigate the influence factors of functional devices and then improve, modify or control their performances, which has important significance for the practical application and electronic industry. Based on first principle and quantum transport calculations, the effects of compressive strain on the current transport and relative electrical properties (such as the electrostatic potential energy, built-in electric field, charge density and polarization, etc.) in gallium nitride (GaN) tunnel junctions are investigated. It is found that there are potential energy drop, built-in electric field and spontaneous polarization in the GaN barrier of the tunnel junction due to the non-centrosymmetric structure of GaN. Furthermore, results also show that all these electrical properties can be adjusted by compressive strain. With the increase of the applied in-plane compressive strain, the piezocharge density in the GaN barrier of the tunnel junction gradually increases. Accordingly, the potential energy drop throughout the GaN barrier gradually flattens and the built-in electric field decreases. Meanwhile, the average

  10. Ordered arrays of bottom-up III-nitride core-shell nanostructures

    Science.gov (United States)

    Rishinaramangalam, Ashwin K.; Nami, Mohsen; Bryant, Benjamin N.; Eller, Rhett F.; Shima, Darryl M.; Fairchild, Michael N.; Balakrishnan, Ganesh; Brueck, S. R. J.; Feezell, Daniel F.

    2015-08-01

    The growth of ordered arrays of group III-nitride nanostructures on c-plane gallium nitride (GaN) on sapphire using selective-area metal organic chemical vapor deposition (MOCVD) is presented. The growth of these nanostructures promotes strain relaxation that allows the combination of high indium content active regions with very low dislocation densities and also gives access to nonpolar and semipolar crystallographic orientations of GaN. The influence of the starting template and the growth conditions on the growth rate and morphology is discussed. The growth of indium gallium nitride (InGaN) active region shells on these nanostructures is discussed and the stability of various crystallographic orientations under typical growth conditions is studied. Finally, the effect of the growth conditions on the morphology of pyramidal stripe LEDs is discussed and preliminary results on electrical injection of these LEDs are presented.

  11. The fundamental surface science of wurtzite gallium nitride

    Science.gov (United States)

    Bermudez, V. M.

    2017-09-01

    A review is presented that covers the experimental and theoretical literature relating to the preparation, electronic structure and chemical and physical properties of the surfaces of the wurtzite form of GaN. The discussion includes the adsorption of various chemical elements and of inorganic, organometallic and organic species. The focus is on work that contributes to a microscopic, atomistic understanding of GaN surfaces and interfaces, and the review concludes with an assessment of possible future directions.

  12. Review of using gallium nitride for ionizing radiation detection

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Jinghui [Nuclear Engineering Program, Department of Mechanical and Aerospace Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Department of Radiology, Stanford University, Stanford, California 94305 (United States); Mulligan, Padhraic; Cao, Lei R., E-mail: cao.152@osu.edu [Nuclear Engineering Program, Department of Mechanical and Aerospace Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Brillson, Leonard [Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Department of Physics, The Ohio State University, Columbus, Ohio 43210 (United States)

    2015-09-15

    With the largest band gap energy of all commercial semiconductors, GaN has found wide application in the making of optoelectronic devices. It has also been used for photodetection such as solar blind imaging as well as ultraviolet and even X-ray detection. Unsurprisingly, the appreciable advantages of GaN over Si, amorphous silicon (a-Si:H), SiC, amorphous SiC (a-SiC), and GaAs, particularly for its radiation hardness, have drawn prompt attention from the physics, astronomy, and nuclear science and engineering communities alike, where semiconductors have traditionally been used for nuclear particle detection. Several investigations have established the usefulness of GaN for alpha detection, suggesting that when properly doped or coated with neutron sensitive materials, GaN could be turned into a neutron detection device. Work in this area is still early in its development, but GaN-based devices have already been shown to detect alpha particles, ultraviolet light, X-rays, electrons, and neutrons. Furthermore, the nuclear reaction presented by {sup 14}N(n,p){sup 14}C and various other threshold reactions indicates that GaN is intrinsically sensitive to neutrons. This review summarizes the state-of-the-art development of GaN detectors for detecting directly and indirectly ionizing radiation. Particular emphasis is given to GaN's radiation hardness under high-radiation fields.

  13. Neutron irradiation effects on gallium nitride-based Schottky diodes

    Energy Technology Data Exchange (ETDEWEB)

    Lin, Chung-Han; Katz, Evan J.; Zhang, Zhichun [Department of Electrical and Computer Engineering, The Ohio State University, Columbus Ohio 43210 (United States); Qiu, Jie; Cao, Lei [Nuclear Engineering Program, Department of Mechanical and Aerospace Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Mishra, Umesh K. [Departments of Electrical and Computer Engineering and Materials Science and Engineering, University of California, Santa Barbara, California 93106 (United States); Brillson, Leonard J. [Department of Electrical and Computer Engineering, The Ohio State University, Columbus Ohio 43210 (United States); Department of Physics and Center for Materials Research, The Ohio State University, Columbus, Ohio 43210 (United States)

    2013-10-14

    Depth-resolved cathodoluminescence spectroscopy (DRCLS), time-resolved surface photovoltage spectroscopy, X-ray photoemission spectroscopy (XPS), and current-voltage measurements together show that fast versus thermal neutrons differ strongly in their electronic and morphological effects on metal-GaN Schottky diodes. Fast and thermal neutrons introduce GaN displacement damage and native point defects, while thermal neutrons also drive metallurgical reactions at metal/GaN interfaces. Defect densities exhibit a threshold neutron fluence below which thermal neutrons preferentially heal versus create new native point defects. Scanning XPS and DRCLS reveal strong fluence- and metal-dependent electronic and chemical changes near the free surface and metal interfaces that impact diode properties.

  14. Neutron irradiation effects on metal-gallium nitride contacts

    Energy Technology Data Exchange (ETDEWEB)

    Katz, Evan J.; Lin, Chung-Han; Zhang, Zhichun [Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Qiu, Jie; Cao, Lei [Nuclear Engineering Program, Department of Mechanical and Aerospace Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Mishra, Umesh K. [Departments of Electrical and Computer Engineering and Materials Science and Engineering University of California, Santa Barbara, California 93106 (United States); Brillson, Leonard J., E-mail: brillson.1@osu.edu [Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210 (United States); Department of Physics and Center for Materials Research, The Ohio State University, Columbus, Ohio 43210 (United States)

    2014-03-28

    We have measured the effect of fast and thermal neutrons on GaN Schottky barriers and ohmic contacts using current–voltage and transmission line method electrical techniques, optical, atomic force and scanning electron microscopy morphological techniques, and X-ray photoemission spectroscopy chemical techniques. These studies reveal a 10{sup 15} n/cm{sup 2} neutron threshold for Schottky barrier ideality factor increases, a 10{sup 15} n/cm{sup 2} fast plus thermal neutron threshold for ohmic contact sheet and contact resistance increases, and 10{sup 16} n/cm{sup 2} neutron fluence threshold for major device degradation identified with thermally driven diffusion of Ga and N into the metal contacts and surface phase changes. These results demonstrate the need for protecting metal-GaN contacts in device applications subject to neutron radiation.

  15. Gallium nitride epitaxy on silicon: Importance of substrate preparation

    Energy Technology Data Exchange (ETDEWEB)

    Martin, G.A.; Sverdlov, B.N.; Botchkarev, A.; Morkoc, H.; Thompson, W.H.; Nayfeh, M.H. [Univ. of Illinois, Urbana, IL (United States); Smith, D.J.; Tsen, S.C.Y. [Arizona State Univ., Tempe, AZ (United States)

    1996-11-01

    Hexagonal GaN films grown on non-isomorphic substrates are usually characterized by numerous threading defects which are essentially boundaries between wurtzite GaN domains where the stacking sequences do not align. One origin of these defects is irregularities on the substrate surface such as surface steps. Using Si <111> substrates and a substrate preparation procedure that makes wide atomically flat terraces, the authors demonstrate that reduction of these irregularities greatly improves the crystalline and luminescent quality of GaN films grown by plasma-enhanced molecular beam epitaxy. X-ray rocking curve width decreases from over 1 degree to less than 20 minutes, while PL halfwidth decreases from over 15 meV to less than 10 meV.

  16. Metallic impurities in gallium nitride grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    McHugo, S.A.; Krueger, J.; Kisielowski, C. [Lawrence Berkeley National Lab., CA (United States)] [and others

    1997-04-01

    Transition metals are often encountered in trace amounts in semiconductors. They have been extensively studied in most elemental and compound systems, since they form deep donor and/or acceptor levels which usually degrade the electronic and optical material properties. Only very little is known about transition metals in recent III-V semiconducting materials, such as GaN, AlN and InN. These few studies have been done exclusively on Metal-Organic Chemical Vapor Deposition (MOCVD) or Hybrid Vapor Phase Epitaxy HVPE-grown GaN. Preliminary x-ray fluorescence studies at the Advanced Light Source, beamline 10.3.1, Lawrence Berkeley National Laboratory have revealed that GaN materials grown by Molecular Beam Epitaxy (MBE) have Fe, Ni and Cr as the dominant transition metal contaminants. This finding is commensurate with the extremely high concentrations of hydrogen, carbon and oxygen (up to 10{sup 20} cm{sup {minus}3}) measured by Secondary Ion Mass Spectroscopy (SIMS). Preliminary work using the mapping capabilities of the x-ray fluorescence microprobe revealed the metal impurities were inhomogeneously distributed over the film. Future work of this collaboration will be to find a correlation between the existence of transition metals in MBE films, as revealed by x-ray fluorescence, and Photoluminescence (PL) spectra taken in the infrared region. Also, the authors will make use of the 1 {mu}m spatial resolution of x-ray microprobe to locate the contaminants in relation to structural defects in the GaN films. Because of the large strain caused by the lattice mismatch between the GaN films and the substrates, the films grow in a columnar order with high densities of grain boundaries and dislocations. These structural defects offer preferential sites for metal precipitation or agglomeration which could degrade the optical properties of this material more so than if the impurities were left dissolved in the GaN.

  17. Experimental studies of electron-phonon interactions in gallium nitride

    CERN Document Server

    Stanton, N M

    2001-01-01

    This thesis presents an experimental investigation of the electron-phonon interaction in GaN. Bulk epilayers, grown by MBE, and AIGaN/GaN heterostructure grown by MOCVD, have been studied. The energy relaxation rate for hot electrons has been measured over a wide range of temperatures, allowing both acoustic and optic phonon emission to be studied in GaN epilayers. Direct phonon measurements, both studying the emission and absorption processes, have been performed. Detection of phonons emitted when hot electrons relax their excess energy complements the measurements of relaxation rates. Absorption of acoustic phonons by the epilayers, using both fixed and extended metal film phonon sources, allowed investigation into the effectiveness of the 2k sub F cutoff in the low mobility layers. The experimental findings are compared with the predictions of theory. AIGaN/GaN heterostructures were characterised and measurements of the energy relaxation rate in the temperature range 4K-40K obtained. Excellent agreement wi...

  18. Gallium nitride nanoparticles for solar-blind detectors

    Indian Academy of Sciences (India)

    Dinesh Kabra; Kripasindhu Sardar; K S Narayan

    2003-10-01

    We investigate the properties of GaN semiconducting nanoparticles as a potential candidate for photodetection in the solar-blind region. The photocurrent spectral response is studied spanning the range 1.6-5.5 eV. A significant fraction of the response is in the range 4-5.5 eV. The results are compared to other optical properties and the origins of the features observed in the spectra are speculated upon.

  19. Strongly localized donor level in oxygen doped gallium nitride

    Energy Technology Data Exchange (ETDEWEB)

    Wetzel, C.; Suski, T.; Ager, J.W. III [Lawrence Berkeley National Lab., CA (United States); Fischer, S.; Meyer, B.K. [Giessen Univ. (Germany). 1. Physikalisches Inst.; Grzegory, I.; Porowski, S. [Polska Akademia Nauk, Warsaw (Poland)

    1996-08-01

    A classification in terms of localization of donor defects in GaN is performed by Raman spectroscopy under large hydrostatic pressure. We observe a significant decrease of free carrier concentration in highly O doped GaN epitaxial films at 22 GPa, indicating the presence of a strongly localized donor defect at large pressure. Monitoring the phonon plasmon coupled mode, we find similarities with results on highly n-type bulk crystals. We refine the model of localized defects in GaN and transfer it to the AlGaN system.

  20. Electrical Activation Studies of Ion Implanted Gallium Nitride

    Science.gov (United States)

    2001-11-20

    Amplifier Electromagnet Controller Lakeshore DRC -91CA Temperature Controller 706 Scanner 196 Digital Multimeter 220 Current Source 617 Electrometer...complete list of publications resulting from this doctoral research. The list is divided into three sections: journal articles, refereed conference...2001. Refereed Conference Proceedings: “Optical Characterization of Mg- and Si-Implanted GaN,” Fellows J., Yeo Y.K., Hengehold R., and Krasnobaev

  1. Density and morphology adjustments of gallium nitride nanowires

    Science.gov (United States)

    Teker, Kasif

    2013-10-01

    This paper presents the morphology and density adjustments of GaN nanostructures via CVD process. GaN nanostructure growth has been carried out using Ga and NH3 as source materials with various catalyst materials, such as Au, Ni, Ag, and Fe between 800 and 1100 °C. The investigation has focused on the effects of process parameters, such as growth temperature and catalyst materials on the GaN nanowire morphology and density. Low temperature (contamination and produces high density of long nanowires, which is very crucial for scale-up manufacturing opportunities.

  2. Gallium Nitride Nanowires Grown by Hydride Vapor Phase Epitaxy

    Institute of Scientific and Technical Information of China (English)

    LIU Zhan-Hui; XIU Xiang-Qan; YAN Huai-Yue; ZHANG Rong; XIE Zi-Li; HAN Ping; SHI Yi; ZHENG You-Dou

    2011-01-01

    @@ GaN nanowires are grown by hydride vapor phase epitaxy using nickel as a catalyst.The properties of the obtained GaN nanowires are characterized by scanning and transmission electron microscopy,electron diffraction,roomtemperature photoluminescence and energy dispersive spectroscopy.The results show that the nanowires are wurtzite single crystals growing along the[0001]direction and a redshift in the photoluminescence is observed due to a superposition of several effects.The Raman spectra are close to those of the bulk GaN and the significantly broadening of those modes indicates the phonon confinement effects associated with the nanoscale dimensions of the system.%GaN nanowires are grown by hydride vapor phase epitaxy using nickel as a catalyst. The properties of the obtained GaN nanowires are characterized by scanning and transmission electron microscopy, electron diffraction, room-temperature photoluminescence and energy dispersive spectroscopy. The results show that the nanowires are wurtzite single crystals growing along the [0001] direction and a redshift in the photoluminescence is observed due to a superposition of several effects. The Raman spectra are close to those of the bulk GaN and the significantly broadening of those modes indicates the phonon confinement effects associated with the nanoscale dimensions of the system.

  3. Auger Recombination in Indium Gallium Nitride: Experimental Evidence

    Science.gov (United States)

    Krames, Michael

    2010-03-01

    Progress in InGaN-based light-emitting diode (LED) technology has resulted in white-light emitters with efficiencies far exceeding those of conventional light sources such as tungsten-filament-based incandescence and mercury-vapor based fluorescence. Indeed, by now efficacies exceeding 150 lumens per Watt for InGaN-based phosphor-converted white LEDs are claimed, which represent a 90% energy savings compared to the conventional incandescent (i.e., ``light bulb'') solution. However, these high performance levels are obtained under conditions of very low forward current-density for the InGaN LED and do not represent true operating conditions (nor cost-effective utilization) for the device. In order to reduce the cost (and thus increase market penetration of) solid-state lighting, more lumens per unit of semiconductor area are required which in practice necessitates higher drive current densities. Unfortunately, at these higher driver current densities, the internal quantum efficiency of InGaN-based LEDs is observed to decrease significantly. In the fall of 2007, researchers at the Advanced Laboratories of Philips Lumileds were the first to propose Auger recombination as the root-cause mechanism in InGaN which was behind this ``efficiency droop'' [1]. They further proposed to circumvent the problem by employing InGaN-based active region designs that maintain low carrier density, and demonstrated an LED device design that reaches a maximum quantum efficiency above 200 A/cm2, compared to ˜1-10 A/cm^2 for typical multiple-quantum-well heterostructures [2]. In this talk we will review the experimental evidence for Auger recombination in InGaN, beginning with the early work from 2007 and then considering additional work from more recent efforts to better understand the details behind this loss mechanism. [4pt] [1] Y. C. Shen, G. O. M"uller, S. Watanabe, N. F. Gardner, A. Munkholm, and M. R. Krames, ``Auger recombination in InGaN measured by photoluminescence'', Appl. Phys. Lett. 91, 141101 (2007). [0pt] [2] N. F. Gardner, G. O. M"uller, Y. C. Shen, G. Chen, S. Watanabe, W. G"otz, and M. R. Krames, ``Blue-emitting InGaN--GaN double-heterostructure light-emitting diodes reaching maximum quantum efficiency above 200 A/cm^2'', Appl. Phys. Lett. 91, 243506 (2007).

  4. Kinase detection with gallium nitride based high electron mobility transistors.

    Science.gov (United States)

    Makowski, Matthew S; Bryan, Isaac; Sitar, Zlatko; Arellano, Consuelo; Xie, Jinqiao; Collazo, Ramon; Ivanisevic, Albena

    2013-07-01

    A label-free kinase detection system was fabricated by the adsorption of gold nanoparticles functionalized with kinase inhibitor onto AlGaN/GaN high electron mobility transistors (HEMTs). The HEMTs were operated near threshold voltage due to the greatest sensitivity in this operational region. The Au NP/HEMT biosensor system electrically detected 1 pM SRC kinase in ionic solutions. These results are pertinent to drug development applications associated with kinase sensing.

  5. Modeling of Gallium Nitride Hydride Vapor Phase Epitaxy

    Science.gov (United States)

    Meyyappan, Meyya; Arnold, James O. (Technical Monitor)

    1997-01-01

    A reactor model for the hydride vapor phase epitaxy of GaN is presented. The governing flow, energy, and species conservation equations are solved in two dimensions to examine the growth characteristics as a function of process variables and reactor geometry. The growth rate varies with GaCl composition but independent of NH3 and H2 flow rates. A change in carrier gas for Ga source from H2 to N2 affects the growth rate and uniformity for a fixed reactor configuration. The model predictions are in general agreement with observed experimental behavior.

  6. Nanostructures of Indium Gallium Nitride Crystals Grown on Carbon Nanotubes.

    Science.gov (United States)

    Park, Ji-Yeon; Man Song, Keun; Min, Yo-Sep; Choi, Chel-Jong; Seok Kim, Yoon; Lee, Sung-Nam

    2015-11-16

    Nanostructure (NS) InGaN crystals were grown on carbon nanotubes (CNTs) using metalorganic chemical vapor deposition. The NS-InGaN crystals, grown on a ~5-μm-long CNT/Si template, were estimated to be ~100-270 nm in size. Transmission electron microscope examinations revealed that single-crystalline InGaN NSs were formed with different crystal facets. The observed green (~500 nm) cathodoluminescence (CL) emission was consistent with the surface image of the NS-InGaN crystallites, indicating excellent optical properties of the InGaN NSs on CNTs. Moreover, the CL spectrum of InGaN NSs showed a broad emission band from 490 to 600 nm. Based on these results, we believe that InGaN NSs grown on CNTs could aid in overcoming the green gap in LED technologies.

  7. Yellow luminescence of gallium nitride generated by carbon defect complexes.

    Science.gov (United States)

    Demchenko, D O; Diallo, I C; Reshchikov, M A

    2013-02-22

    We demonstrate that yellow luminescence often observed in both carbon-doped and pristine GaN is the result of electronic transitions via the C(N)-O(N) complex. In contrast to common isolated defects, the C(N)-O(N) complex is energetically favorable, and its calculated optical properties, such as absorption and emission energies, a zero phonon line, and the thermodynamic transition level, all show excellent agreement with measured luminescence data. Thus, by combining hybrid density functional theory and experimental measurements, we propose a solution to a long-standing problem of the GaN yellow luminescence.

  8. Review of using gallium nitride for ionizing radiation detection

    Science.gov (United States)

    Wang, Jinghui; Mulligan, Padhraic; Brillson, Leonard; Cao, Lei R.

    2015-09-01

    With the largest band gap energy of all commercial semiconductors, GaN has found wide application in the making of optoelectronic devices. It has also been used for photodetection such as solar blind imaging as well as ultraviolet and even X-ray detection. Unsurprisingly, the appreciable advantages of GaN over Si, amorphous silicon (a-Si:H), SiC, amorphous SiC (a-SiC), and GaAs, particularly for its radiation hardness, have drawn prompt attention from the physics, astronomy, and nuclear science and engineering communities alike, where semiconductors have traditionally been used for nuclear particle detection. Several investigations have established the usefulness of GaN for alpha detection, suggesting that when properly doped or coated with neutron sensitive materials, GaN could be turned into a neutron detection device. Work in this area is still early in its development, but GaN-based devices have already been shown to detect alpha particles, ultraviolet light, X-rays, electrons, and neutrons. Furthermore, the nuclear reaction presented by 14N(n,p)14C and various other threshold reactions indicates that GaN is intrinsically sensitive to neutrons. This review summarizes the state-of-the-art development of GaN detectors for detecting directly and indirectly ionizing radiation. Particular emphasis is given to GaN's radiation hardness under high-radiation fields.

  9. Spectroscopic characterization of radiation-induced defects in gallium nitride

    Science.gov (United States)

    Yang, Qing

    Radiation damage studies of GaN provide insights into the fundamental properties of the material as well as the basic knowledge needed to predict degradation of GaN-based devices in space-based applications or other radiation environments. The main interests are in investigating the properties of radiation-induced defects at the microscopic level and providing data to evaluate the radiation hardness of the material. Selective damage of the N-sublattice is achieved with 0.42 MeV electron irradiation. Two new luminescence lines at 3.4732 eV and 3.4545 eV are detected by time-resolved photoluminescence after irradiation. The two lines are associated with the ground state bound exciton of a new donor B1 and its two-electron transition. The donor binding energy of B1 is determined as 24.9 +/- 0.4 meV, shallower than the impurity donors ON and Si Ga. Among the possible defects, the nitrogen vacancy (VN) is the best candidate for the new donor B1. In addition, a change under focused 267 nm laser beam is observed at cryogenic temperatures in the excitonic luminescence of the irradiated sample. The donor bound exciton intensity of ON and SiGa, the total band edge luminescence intensity, and the luminescence decay lifetime of free and bound excitons all increase with laser exposure time. In contrast, the relative intensity of the B 1 bound exciton emission decreases. The change is not observed with below bandgap illumination. We propose that the light-induced change reflects the illumination-assisted dissociation of non-radiative defect complexes O N-Ni and SiGa-Ni, and subsequently the migration of Ni and at least partial annihilation of N i at VN. The new donor B1 bound exciton emission and the light-induced change starts to disappear at annealing temperature around 300°C, indicating the annihilation of the irradiation-induced vacancy and interstitial defects. An activation energy of 1.5 eV is obtained, which is proposed to be the sum of the dissociation energy of the ON-N i and SiGa-Ni complexes and the migration barrier of the Ni-. Irradiation with 25 MeV and 55 MeV protons causes damage in both Ga and N-sublattices. A radiation-induced increase in the yellow luminescence and red-shift of the YL peak are observed in a free-standing HVPE GaN after proton irradiation, indicating the introduction of Ga-vacancies. Time-resolved photoluminescence reveals a significant reduction of the carrier lifetime in addition to the decrease in luminescence intensity. Carrier lifetime degradation constants are in the range of 10-15 to 10-14 cm 2/ns, which is 5 to 25 times better than for GaAs. (Abstract shortened by UMI.)

  10. Growth of Gallium Nitride Nanorods and Their Coalescence Overgrowth

    Science.gov (United States)

    2012-09-07

    NRs on silicon substrate, thermal stress can be released such that wafer cracking can be avoided and the crystal quality of the coalesced overgrown...thick GaN template, which is deposited with MOCVD on c-plane sapphire substrate [1, 14]. On the wafer , a two-dimensional (2-D) triangular pattern of...mask to form a triangular bump [1]. Figure 5(a) shows the cross-sectional TEM image of a few fallen QW NRs. We focus the observation at the circled

  11. Gallium Safety in the Laboratory

    Energy Technology Data Exchange (ETDEWEB)

    Lee C. Cadwallader

    2003-06-01

    A university laboratory experiment for the US Department of Energy magnetic fusion research program required a simulant for liquid lithium. The simulant choices were narrowed to liquid gallium and galinstan (Ga-In-Sn) alloy. Safety information on liquid gallium and galinstan were compiled, and the choice was made to use galinstan. A laboratory safety walkthrough was performed in the fall of 2002 to support the galinstan experiment. The experiment has been operating successfully since early 2002.

  12. Gallium Safety in the Laboratory

    Energy Technology Data Exchange (ETDEWEB)

    Cadwallader, L.C.

    2003-05-07

    A university laboratory experiment for the US Department of Energy magnetic fusion research program required a simulant for liquid lithium. The simulant choices were narrowed to liquid gallium and galinstan (Ga-In-Sn) alloy. Safety information on liquid gallium and galinstan were compiled, and the choice was made to use galinstan. A laboratory safety walkthrough was performed in the fall of 2002 to support the galinstan experiment. The experiment has been operating successfully since early 2002.

  13. Gallium-67 myocardial scintigraphy in dilated cardiomyopathy

    Energy Technology Data Exchange (ETDEWEB)

    Aoki, Toshikazu; Konishi, Tokuji; Koyama, Takao; Morita, Yuriko; Futagami, Yasuo; Hayashi, Takamaro; Hamada, Masayuki; Nakano, Takeshi

    1988-12-01

    Gallium-67 imaging has been employed clinically in the detection of malignant tumor or chronic inflammatory disease. In this study, we evaluated the usefulness of Gallium-67 myocardial imaging as an adjunct to endomyocardial biopsy in the diagnosis of myocarditis. Nine patients who had been diagnosed clinically as dilated cardiomyopathy underwent Gallium-67 myocardial imaging. Left ventricular endomyocardial biopsy was performed on all patients. Two had positive Gallium-67 imaging, but myocarditis was not proven in their tissue specimen. Two others with proven myocarditis had negative Gallium-67 imaging. These results suggest that Gallium-67 imaging is not always a useful tool to detect latent myocarditis in patients with dilated cardiomyopathy.

  14. Microwave power aluminum gallium nitride/gallium nitride heterojunction field effect transistor for X-band applications

    Science.gov (United States)

    Cai, Shujun

    GaN material has been considered in recent years an attractive candidate for microwave power applications owing to its strong piezo-electric (PZ) and spontaneous polarization (SP) effects, high saturation velocity and wideband gap. AlGaN/GaN Heterojunction Field Effect Transistor (HFET) is chosen to overcome the disadvantages of low mobility in wide bandgap materials so that both high power and high speed are feasible. Analysis and simulation are performed to understand the enhancement of sheet charge density due to the PZ and SP effects in the AlGaN/GaN material system. Major factors affecting the sheet channel charge density are discussed. To verify the PZ and SP charge effects, testing structures of AlGaN/GaN with various Al contents for Hall measurement are then fabricated. Results support our analysis. GaN-based HFET devices with 25% Al content are fabricated after solving process issues. An external transconductance of 200 mS/mm, a saturation current density of 800 mA/mm and a breakdown voltage of 40 V to 50 V are achieved. A CW power amplifier with the output of 8 W at 9 GHz is achieved from a single 5 mm AlGaN/GaN HFET device. A novel process, referred to as Gamma gate process, is developed to realize high breakdown performance as well as small gate length. As a result, a 0.3 mum gate length device with an integrated field plate is fabricated using 1 mum conventional optical lithograph techniques. Improvements of breakdown voltage and RF performance by a factor of over 2 have been achieved. High temperature storage and measurement show that the AlGaN/GaN HFET devices can survive at an environment temperature as high as 592°C. The devices also survive after exposing to proton irradiation at a dosage of 1 x 1014 cm-2, indicating its intrinsic resistance to radiation.

  15. Compensation of native donor doping in ScN: Carrier concentration control and p-type ScN

    Science.gov (United States)

    Saha, Bivas; Garbrecht, Magnus; Perez-Taborda, Jaime A.; Fawey, Mohammed H.; Koh, Yee Rui; Shakouri, Ali; Martin-Gonzalez, Marisol; Hultman, Lars; Sands, Timothy D.

    2017-06-01

    Scandium nitride (ScN) is an emerging indirect bandgap rocksalt semiconductor that has attracted significant attention in recent years for its potential applications in thermoelectric energy conversion devices, as a semiconducting component in epitaxial metal/semiconductor superlattices and as a substrate material for high quality GaN growth. Due to the presence of oxygen impurities and native defects such as nitrogen vacancies, sputter-deposited ScN thin-films are highly degenerate n-type semiconductors with carrier concentrations in the (1-6) × 1020 cm-3 range. In this letter, we show that magnesium nitride (MgxNy) acts as an efficient hole dopant in ScN and reduces the n-type carrier concentration, turning ScN into a p-type semiconductor at high doping levels. Employing a combination of high-resolution X-ray diffraction, transmission electron microscopy, and room temperature optical and temperature dependent electrical measurements, we demonstrate that p-type Sc1-xMgxN thin-film alloys (a) are substitutional solid solutions without MgxNy precipitation, phase segregation, or secondary phase formation within the studied compositional region, (b) exhibit a maximum hole-concentration of 2.2 × 1020 cm-3 and a hole mobility of 21 cm2/Vs, (c) do not show any defect states inside the direct gap of ScN, thus retaining their basic electronic structure, and (d) exhibit alloy scattering dominating hole conduction at high temperatures. These results demonstrate MgxNy doped p-type ScN and compare well with our previous reports on p-type ScN with manganese nitride (MnxNy) doping.

  16. Discovery of earth-abundant nitride semiconductors by computational screening and high-pressure synthesis.

    Science.gov (United States)

    Hinuma, Yoyo; Hatakeyama, Taisuke; Kumagai, Yu; Burton, Lee A; Sato, Hikaru; Muraba, Yoshinori; Iimura, Soshi; Hiramatsu, Hidenori; Tanaka, Isao; Hosono, Hideo; Oba, Fumiyasu

    2016-06-21

    Nitride semiconductors are attractive because they can be environmentally benign, comprised of abundant elements and possess favourable electronic properties. However, those currently commercialized are mostly limited to gallium nitride and its alloys, despite the rich composition space of nitrides. Here we report the screening of ternary zinc nitride semiconductors using first-principles calculations of electronic structure, stability and dopability. This approach identifies as-yet-unreported CaZn2N2 that has earth-abundant components, smaller carrier effective masses than gallium nitride and a tunable direct bandgap suited for light emission and harvesting. High-pressure synthesis realizes this phase, verifying the predicted crystal structure and band-edge red photoluminescence. In total, we propose 21 promising systems, including Ca2ZnN2, Ba2ZnN2 and Zn2PN3, which have not been reported as semiconductors previously. Given the variety in bandgaps of the identified compounds, the present study expands the potential suitability of nitride semiconductors for a broader range of electronic, optoelectronic and photovoltaic applications.

  17. Discovery of earth-abundant nitride semiconductors by computational screening and high-pressure synthesis

    Science.gov (United States)

    Hinuma, Yoyo; Hatakeyama, Taisuke; Kumagai, Yu; Burton, Lee A.; Sato, Hikaru; Muraba, Yoshinori; Iimura, Soshi; Hiramatsu, Hidenori; Tanaka, Isao; Hosono, Hideo; Oba, Fumiyasu

    2016-01-01

    Nitride semiconductors are attractive because they can be environmentally benign, comprised of abundant elements and possess favourable electronic properties. However, those currently commercialized are mostly limited to gallium nitride and its alloys, despite the rich composition space of nitrides. Here we report the screening of ternary zinc nitride semiconductors using first-principles calculations of electronic structure, stability and dopability. This approach identifies as-yet-unreported CaZn2N2 that has earth-abundant components, smaller carrier effective masses than gallium nitride and a tunable direct bandgap suited for light emission and harvesting. High-pressure synthesis realizes this phase, verifying the predicted crystal structure and band-edge red photoluminescence. In total, we propose 21 promising systems, including Ca2ZnN2, Ba2ZnN2 and Zn2PN3, which have not been reported as semiconductors previously. Given the variety in bandgaps of the identified compounds, the present study expands the potential suitability of nitride semiconductors for a broader range of electronic, optoelectronic and photovoltaic applications. PMID:27325228

  18. Gallium localization in peritonitis. Two case reports

    Energy Technology Data Exchange (ETDEWEB)

    LaManna, M.M.; Saluk, P.H.; Zekavat, P.P.; Mobini, J.; Parker, J.A.

    1984-01-01

    Diffuse abdominal localization of gallium was found in two patients with peritonitis, one due to M. tuberculosis and the other presumably pyogenic. Gallium scanning may be useful in the diagnosis of peritonitis and perhaps of other serosal infections.

  19. Field-effect transistors based on cubic indium nitride.

    Science.gov (United States)

    Oseki, Masaaki; Okubo, Kana; Kobayashi, Atsushi; Ohta, Jitsuo; Fujioka, Hiroshi

    2014-02-04

    Although the demand for high-speed telecommunications has increased in recent years, the performance of transistors fabricated with traditional semiconductors such as silicon, gallium arsenide, and gallium nitride have reached their physical performance limits. Therefore, new materials with high carrier velocities should be sought for the fabrication of next-generation, ultra-high-speed transistors. Indium nitride (InN) has attracted much attention for this purpose because of its high electron drift velocity under a high electric field. Thick InN films have been applied to the fabrication of field-effect transistors (FETs), but the performance of the thick InN transistors was discouraging, with no clear linear-saturation output characteristics and poor on/off current ratios. Here, we report the epitaxial deposition of ultrathin cubic InN on insulating oxide yttria-stabilized zirconia substrates and the first demonstration of ultrathin-InN-based FETs. The devices exhibit high on/off ratios and low off-current densities because of the high quality top and bottom interfaces between the ultrathin cubic InN and oxide insulators. This first demonstration of FETs using a ultrathin cubic indium nitride semiconductor will thus pave the way for the development of next-generation high-speed electronics.

  20. Gallium phosphide energy converters

    Energy Technology Data Exchange (ETDEWEB)

    Sims, P.E.; Dinetta, L.C.; Goetz, M.A.

    1995-10-01

    Gallium phosphide (GaP) energy converters may be successfully deployed to provide new mission capabilities for spacecraft. Betavoltaic power supplies based on the conversion of tritium beta decay to electricity using GaP energy converters can supply long term low-level power with high reliability. High temperature solar cells, also based on GaP, can be used in inward-bound missions greatly reducing the need for thermal dissipation. Results are presented for GaP direct conversion devices powered by Ni-63 and compared to the conversion of light emitted by tritiarated phosphors. Leakage currents as low as 1.2 x 10(exp {minus}17) A/sq cm have been measured and the temperature dependence of the reverse saturation current is found to have ideal behavior. Temperature dependent IV, QE, R(sub sh), and V(sub oc) results are also presented. These data are used to predict the high-temperature solar cell and betacell performance of GaP devices and suggest appropriate applications for the deployment of this technology.

  1. Medical Applications and Toxicities of Gallium Compounds

    Directory of Open Access Journals (Sweden)

    Christopher R. Chitambar

    2010-05-01

    Full Text Available Over the past two to three decades, gallium compounds have gained importance in the fields of medicine and electronics. In clinical medicine, radioactive gallium and stable gallium nitrate are used as diagnostic and therapeutic agents in cancer and disorders of calcium and bone metabolism. In addition, gallium compounds have displayed anti-inflammatory and immunosuppressive activity in animal models of human disease while more recent studies have shown that gallium compounds may function as antimicrobial agents against certain pathogens. In a totally different realm, the chemical properties of gallium arsenide have led to its use in the semiconductor industry. Gallium compounds, whether used medically or in the electronics field, have toxicities. Patients receiving gallium nitrate for the treatment of various diseases may benefit from such therapy, but knowledge of the therapeutic index of this drug is necessary to avoid clinical toxicities. Animals exposed to gallium arsenide display toxicities in certain organ systems suggesting that environmental risks may exist for individuals exposed to this compound in the workplace. Although the arsenic moiety of gallium arsenide appears to be mainly responsible for its pulmonary toxicity, gallium may contribute to some of the detrimental effects in other organs. The use of older and newer gallium compounds in clinical medicine may be advanced by a better understanding of their mechanisms of action, drug resistance, pharmacology, and side-effects. This review will discuss the medical applications of gallium and its mechanisms of action, the newer gallium compounds and future directions for development, and the toxicities of gallium compounds in current use.

  2. Elastic properties of indium nitrides grown on sapphire substrates determined by nano-indentation: In comparison with other nitrides

    Directory of Open Access Journals (Sweden)

    Ichiro Yonenaga

    2015-07-01

    Full Text Available The hardness of wurtzite indium nitride (α-InN films of 0.5 to 4 μm in thickness was measured by the nano-indentation method at room temperature. After investigation of crystalline quality by x-ray diffraction, the hardness and Young’s modulus were determined to be 8.8 ± 0.4 and 184 ± 5 GPa, respectively, for the In (0001- and N ( 000 1 ̄ -growth faces of InN films. The bulk and shear moduli were then derived to be 99 ± 3 and 77 ± 2 GPa, respectively. The Poisson’s ratio was evaluated to be 0.17 ± 0.03. The results were examined comprehensively in comparison with previously reported data of InN as well as those of other nitrides of aluminum nitride and gallium nitride. The underlying physical process determining the moduli and hardness was examined in terms of atomic bonding and dislocation energy of the nitrides and wurtzite zinc oxide.

  3. Performance of GaN-on-Si-based vertical light-emitting diodes using silicon nitride electrodes with conducting filaments: correlation between filament density and device reliability.

    Science.gov (United States)

    Kim, Kyeong Heon; Kim, Su Jin; Lee, Tae Ho; Lee, Byeong Ryong; Kim, Tae Geun

    2016-08-08

    Transparent conductive electrodes with good conductivity and optical transmittance are an essential element for highly efficient light-emitting diodes. However, conventional indium tin oxide and its alternative transparent conductive electrodes have some trouble with a trade-off between electrical conductivity and optical transmittance, thus limiting their practical applications. Here, we present silicon nitride transparent conductive electrodes with conducting filaments embedded using the electrical breakdown process and investigate the dependence of the conducting filament density formed in the transparent conductive electrode on the device performance of gallium nitride-based vertical light-emitting diodes. Three gallium nitride-on-silicon-based vertical light-emitting diodes using silicon nitride transparent conductive electrodes with high, medium, and low conducting filament densities were prepared with a reference vertical light-emitting diode using metal electrodes. This was carried to determine the optimal density of the conducting filaments in the proposed silicon nitride transparent conductive electrodes. In comparison, the vertical light-emitting diodes with a medium conducting filament density exhibited the lowest optical loss, direct ohmic behavior, and the best current injection and distribution over the entire n-type gallium nitride surface, leading to highly reliable light-emitting diode performance.

  4. Common features of gallium perovskites

    NARCIS (Netherlands)

    Aleksiyko, R; Berkowski, M; Byszewski, P; Dabrowski, B; Diduszko, R; Fink-Finowicki, J; Vasylechko, LO

    2001-01-01

    The Czochralski and floating zone methods have been used to grow single crystals of gallium perovskites solid solutions with rare earth elements La, Pr, Nd, Sm and with Sr. The structure of the crystals has been investigated by powder X-ray, synchrotron radiation and neutron diffraction methods over

  5. Numerical investigation of crystal growth process of bulk Si and nitrides - a review

    Energy Technology Data Exchange (ETDEWEB)

    Kakimoto, K.; Liu, L.; Miyazawa, H.; Nakano, S.; Kashiwagi, D.; Chen, X.J.; Kangawa, Y. [Research Institute for Applied Mechanics, Kyushu University, Kasuga (Japan)

    2007-12-15

    Heat and mass transfer during crystal growth of bulk Si and nitrides by using numerical analysis was studied. A three-dimensional analysis was carried out to investigate temperature distribution and solid-liquid interface shape of silicon for large-scale integrated circuits and photovoltaic silicon. The analysis enables prediction of the solid-liquid interface shape of silicon crystals. The result shows that the interface shape became bevel like structure in the case without crystal rotation. We also carried out analysis of nitrogen transfer in gallium melt during crystal growth of gallium nitride using liquid-phase epitaxy. The result shows that the growth rate at the center was smaller than that at the center. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  6. Gallium antimonide texturing for enhanced light extraction from infrared optoelectronics devices

    Science.gov (United States)

    Wassweiler, Ella; Toor, Fatima

    2016-06-01

    The use of gallium antimonide (GaSb) is increasing, especially for optoelectronic devices in the infrared wavelengths. It has been demonstrated in gallium nitride (GaN) devices operating at ultraviolet (UV) wavelengths, that surface textures increase the overall device efficiency. In this work, we fabricated eight different surface textures in GaSb to be used in enhancing efficiency in infrared wavelength devices. Through chemical etching with hydrofluoric acid, hydrogen peroxide, and tartaric acid we characterize the types of surface textures formed and the removal rate of entire layers of GaSb. Through optimization of the etching recipes we lower the reflectivity from 35.7% to 1% at 4 μm wavelength for bare and textured GaSb, respectively. In addition, we simulate surface textures using ray optics in finite element method solver software to provide explanation of our experimental findings.

  7. Gallium antimonide texturing for enhanced light extraction from infrared optoelectronics devices

    Directory of Open Access Journals (Sweden)

    Ella Wassweiler

    2016-06-01

    Full Text Available The use of gallium antimonide (GaSb is increasing, especially for optoelectronic devices in the infrared wavelengths. It has been demonstrated in gallium nitride (GaN devices operating at ultraviolet (UV wavelengths, that surface textures increase the overall device efficiency. In this work, we fabricated eight different surface textures in GaSb to be used in enhancing efficiency in infrared wavelength devices. Through chemical etching with hydrofluoric acid, hydrogen peroxide, and tartaric acid we characterize the types of surface textures formed and the removal rate of entire layers of GaSb. Through optimization of the etching recipes we lower the reflectivity from 35.7% to 1% at 4 μm wavelength for bare and textured GaSb, respectively. In addition, we simulate surface textures using ray optics in finite element method solver software to provide explanation of our experimental findings.

  8. Methods of forming boron nitride

    Science.gov (United States)

    Trowbridge, Tammy L; Wertsching, Alan K; Pinhero, Patrick J; Crandall, David L

    2015-03-03

    A method of forming a boron nitride. The method comprises contacting a metal article with a monomeric boron-nitrogen compound and converting the monomeric boron-nitrogen compound to a boron nitride. The boron nitride is formed on the same or a different metal article. The monomeric boron-nitrogen compound is borazine, cycloborazane, trimethylcycloborazane, polyborazylene, B-vinylborazine, poly(B-vinylborazine), or combinations thereof. The monomeric boron-nitrogen compound is polymerized to form the boron nitride by exposure to a temperature greater than approximately 100.degree. C. The boron nitride is amorphous boron nitride, hexagonal boron nitride, rhombohedral boron nitride, turbostratic boron nitride, wurzite boron nitride, combinations thereof, or boron nitride and carbon. A method of conditioning a ballistic weapon and a metal article coated with the monomeric boron-nitrogen compound are also disclosed.

  9. Methods of forming boron nitride

    Energy Technology Data Exchange (ETDEWEB)

    Trowbridge, Tammy L; Wertsching, Alan K; Pinhero, Patrick J; Crandall, David L

    2015-03-03

    A method of forming a boron nitride. The method comprises contacting a metal article with a monomeric boron-nitrogen compound and converting the monomeric boron-nitrogen compound to a boron nitride. The boron nitride is formed on the same or a different metal article. The monomeric boron-nitrogen compound is borazine, cycloborazane, trimethylcycloborazane, polyborazylene, B-vinylborazine, poly(B-vinylborazine), or combinations thereof. The monomeric boron-nitrogen compound is polymerized to form the boron nitride by exposure to a temperature greater than approximately 100.degree. C. The boron nitride is amorphous boron nitride, hexagonal boron nitride, rhombohedral boron nitride, turbostratic boron nitride, wurzite boron nitride, combinations thereof, or boron nitride and carbon. A method of conditioning a ballistic weapon and a metal article coated with the monomeric boron-nitrogen compound are also disclosed.

  10. Construction of Gallium Point at NMIJ

    Science.gov (United States)

    Widiatmo, J. V.; Saito, I.; Yamazawa, K.

    2017-03-01

    Two open-type gallium point cells were fabricated using ingots whose nominal purities are 7N. Measurement systems for the realization of the melting point of gallium using these cells were built. The melting point of gallium is repeatedly realized by means of the measurement systems for evaluating the repeatability. Measurements for evaluating the effect of hydrostatic pressure coming from the molten gallium existing during the melting process and the effect of gas pressure that fills the cell were also performed. Direct cell comparisons between those cells were conducted. This comparison was aimed to evaluate the consistency of each cell, especially related to the nominal purity. Direct cell comparison between the open-type and the sealed-type gallium point cell was also conducted. Chemical analysis was conducted using samples extracted from ingots used in both the newly built open-type gallium point cells, from which the effect of impurities in the ingot was evaluated.

  11. Optical control of gallium nanoparticle growth

    Science.gov (United States)

    MacDonald, K. F.; Fedotov, V. A.; Pochon, S.; Ross, K. J.; Stevens, G. C.; Zheludev, N. I.; Brocklesby, W. S.; Emel'yanov, V. I.

    2002-03-01

    We report that low-intensity light can dramatically influence and regulate the nanoparticle self-assembly process: Illumination of a substrate exposed to a beam of gallium atoms results in the formation of gallium nanoparticles with a relatively narrow size distribution. Very low light intensities, below the threshold for thermally induced evaporation, exert considerable control over nanoparticle formation.

  12. Gallium-67 citrate scan in extrapulmonary tuberculosis

    Energy Technology Data Exchange (ETDEWEB)

    Lin Wanyu [Taichung Veterans General Hospital (Taiwan). Dept. of Nuclear Medicine; Hsieh Jihfang [Chi-Mei Foundation Hospital, Tainan (Taiwan)

    1999-07-01

    Aim: Whole-body gallium scan was performed to evaluate the usefulness of gallium scan for detecting extrapulmonary tuberculosis (TB) lesions. Methods: Thirty-seven patients with extrapulmonary TB were included in this study. Four patients were found to have two lesions. Totally, 41 lesions were identified, including 19 TB arthritis, 8 spinal TB, 5 TB meningitis, 3 TB lymphadenopathy, 2 TB pericarditis, 1 TB peritonitis, 1 intestinal TB, 1 skin TB and 1 renal TB. Results: Of the 41 extrapulmonary TB lesions, gallium scan detected 32 lesions with a sensitivity of 78%. All the patients with TB meningitis showed negative gallium scan. When the five cases of TB meningitis were excluded, the detection sensitivity of gallium scan increased to 88.9% (32/36). Conclusion: Our data revealed that gallium scan is a convenient and useful method for evaluating extrapulmonary TB lesions other than TB-meningitis. We suggest that gallium scan be included in the clinical routine for patients with suspected extrapulmonary TB. (orig.) [German] Ziel: Es wurden Ganzkoerper-Gallium-Szintigramme angefertigt, um den Nutzen der Gallium-Szintigraphie zur Erfassung von extrapulmonalen Tuberkuloseherden (TB) zu erfassen. Methoden: 37 Patienten mit extrapulmonaler TB wurden eingeschlossen. 4 Patienten hatten 2 Laesionen. Insgesamt wurden 41 Laesionen identifiziert, hierunter 19 TB-Arthritis, 8 spinale TB, 5 TB-Meningitis, 3 TB-Lymphadenopathie, 2 TB-Perikarditis, 1 TB-Peritonitis, 1 intestinale TB, 1 Haut-TB und eine Nieren-TB. Ergebnisse: Von den 41 extrapulmonalen TB-Herden erfasste die Gallium-Szintigraphie 32 Herde mit einer Sensitivitaet von 78%. Alle Patienten mit TB-Meningitis zeigten einen negativen Gallium-Scan. Wenn die 5 Faelle mit TB-Meningitis ausgeschlossen wurden, stieg die Sensitivititaet der Gallium-Szintigraphie auf 88,9% (32/36). Schlussfolgerung: Die Daten zeigen, dass die Gallium-Szintigraphie eine einfache und nuetzliche Methode zur Erfassung extrapulmonaler TB-Herde ist

  13. A first principle study of band structure of III-nitride compounds

    Energy Technology Data Exchange (ETDEWEB)

    Ahmed, Rashid [Centre for High Energy Physics University of the Punjab, Lahore-54590 (Pakistan)]. E-mail: rasofi@hotmail.com; Akbarzadeh, H. [Department of Physics, Isfahan University of Technology, 841546 Isfahan (Iran, Islamic Republic of); Fazal-e-Aleem [Centre for High Energy Physics University of the Punjab, Lahore-54590 (Pakistan)

    2005-12-15

    The band structure of both phases, zinc-blende and wurtzite, of aluminum nitride, indium nitride and gallium nitride has been studied using computational methods. The study has been done using first principle full-potential linearized augmented plane wave (FP-LAPW) method, within the framework of density functional theory (DFT). For the exchange correlation potential, generalized gradient approximation (GGA) and an alternative form of GGA proposed by Engel and Vosko (GGA-EV) have been used. Results obtained for band structure of these compounds have been compared with experimental results as well as other first principle computations. Our results show a significant improvement over other theoretical work and are closer to the experimental data.

  14. Heterostructures for Increased Quantum Efficiency in Nitride LEDs

    Energy Technology Data Exchange (ETDEWEB)

    Davis, Robert F. [Carnegie Mellon Univ., Pittsburgh, PA (United States)

    2010-09-30

    Task 1. Development of an advanced LED simulator useful for the design of efficient nitride-based devices. Simulator will contain graphical interface software that can be used to specify the device structure, the material parameters, the operating conditions and the desired output results. Task 2. Theoretical and experimental investigations regarding the influence on the microstructure, defect concentration, mechanical stress and strain and IQE of controlled changes in the chemistry and process route of deposition of the buffer layer underlying the active region of nitride-based blue- and greenemitting LEDs. Task 3. Theoretical and experimental investigations regarding the influence on the physical properties including polarization and IQE of controlled changes in the geometry, chemistry, defect density, and microstructure of components in the active region of nitride-based blue- and green-emitting LEDs. Task 4. Theoretical and experimental investigations regarding the influence on IQE of novel heterostructure designs to funnel carriers into the active region for enhanced recombination efficiency and elimination of diffusion beyond this region. Task 5. Theoretical and experimental investigations regarding the influence of enhanced p-type doping on the chemical, electrical, and microstructural characteristics of the acceptor-doped layers, the hole injection levels at Ohmic contacts, the specific contact resistivity and the IQE of nitride-based blue- and green-emitting LEDs. Development and optical and electrical characterization of reflective Ohmic contacts to n- and p-type GaN films.

  15. Boron Nitride Nanotubes

    Science.gov (United States)

    Smith, Michael W. (Inventor); Jordan, Kevin (Inventor); Park, Cheol (Inventor)

    2012-01-01

    Boron nitride nanotubes are prepared by a process which includes: (a) creating a source of boron vapor; (b) mixing the boron vapor with nitrogen gas so that a mixture of boron vapor and nitrogen gas is present at a nucleation site, which is a surface, the nitrogen gas being provided at a pressure elevated above atmospheric, e.g., from greater than about 2 atmospheres up to about 250 atmospheres; and (c) harvesting boron nitride nanotubes, which are formed at the nucleation site.

  16. Boron nitride composites

    Science.gov (United States)

    Kuntz, Joshua D.; Ellsworth, German F.; Swenson, Fritz J.; Allen, Patrick G.

    2016-02-16

    According to one embodiment, a composite product includes hexagonal boron nitride (hBN), and a plurality of cubic boron nitride (cBN) particles, wherein the plurality of cBN particles are dispersed in a matrix of the hBN. According to another embodiment, a composite product includes a plurality of cBN particles, and one or more borate-containing binders.

  17. Boron nitride composites

    Energy Technology Data Exchange (ETDEWEB)

    Kuntz, Joshua D.; Ellsworth, German F.; Swenson, Fritz J.; Allen, Patrick G.

    2016-02-16

    According to one embodiment, a composite product includes hexagonal boron nitride (hBN), and a plurality of cubic boron nitride (cBN) particles, wherein the plurality of cBN particles are dispersed in a matrix of the hBN. According to another embodiment, a composite product includes a plurality of cBN particles, and one or more borate-containing binders.

  18. Design of P-Type Cladding Layers for Tunnel-Injected UVA Light Emitting Diodes

    CERN Document Server

    Zhang, Yuewei; Akyol, Fatih; Allerman, Andrew A; Moseley, Michael W; Armstrong, Andrew M; Rajan, Siddharth

    2016-01-01

    We discuss the engineering of p-AlGaN cladding layers for achieving efficient tunnel-injected III-Nitride ultraviolet light emitting diodes (UV LEDs) in the UV-A spectral range. We show that capacitance-voltage measurements can be used to estimate the compensation and doping in p-AlGaN layers located between the multi-quantum well region and the tunnel junction layer. By increasing the p-type doping concentration to overcome the background compensation, on-wafer external quantum efficiency and wall-plug efficiency of 3.37% and 1.62% were achieved for tunnel-injected UV LEDs emitting at 325 nm. We also show that interband tunneling hole injection can be used to realize UV LEDs without any acceptor doping. The work discussed here provides new understanding of hole doping and transport in AlGaN-based UV LEDs, and demonstrates the excellent performance of tunnel-injected LEDs for the UV-A wavelength range.

  19. Evidence for an iron-hydrogen complex in p-type silicon

    Science.gov (United States)

    Leonard, S.; Markevich, V. P.; Peaker, A. R.; Hamilton, B.; Murphy, J. D.

    2015-07-01

    Interactions of hydrogen with iron have been studied in Fe contaminated p-type Czochralski silicon using capacitance-voltage profiling and deep level transient spectroscopy (DLTS). Hydrogen has been introduced into the samples from a silicon nitride layer grown by plasma enhanced chemical vapor deposition. After annealing of the Schottky diodes on Si:Fe + H samples under reverse bias in the temperature range of 90-120 °C, a trap has been observed in the DLTS spectra which we have assigned to a Fe-H complex. The trap is only observed when a high concentration of hydrogen is present in the near surface region. The trap concentration is higher in samples with a higher concentration of single interstitial Fe atoms. The defect has a deep donor level at Ev + 0.31 eV. Direct measurements of capture cross section of holes have shown that the capture cross section is not temperature dependent and its value is 5.2 × 10-17 cm2. It is found from an isochronal annealing study that the Fe-H complex is not very stable and can be eliminated completely by annealing for 30 min at 125 °C.

  20. Bismuth incorporation into gallium phosphide

    Energy Technology Data Exchange (ETDEWEB)

    Jena, Puru [Virginia Commonwealth Univ. (United States); Kandalam, Anil K. [West Chester Univ. of Pennsylvania (United States); Christian, Theresa M. [National Renewable Energy Lab. (United States); Beaton, Daniel A. [National Renewable Energy Lab. (United States); Mascarenhas, Angelo [National Renewable Energy Lab. (United States); Alberi, Kirstin [National Renewable Energy Lab. (United States)

    2016-12-21

    Gallium phosphide bismide (GaP1-xBix) epilayers with bismuth fractions from 0.9% to 3.2%, as calculated from lattice parameter measurements, were studied with Rutherford backscattering spectrometry (RBS) to directly measure bismuth incorporation. The total bismuth fractions found by RBS were higher than expected from the lattice parameter calculations. Furthermore, in one analyzed sample grown by molecular beam epitaxy at 300 degrees C, 55% of incorporated bismuth was found to occupy interstitial sites. We discuss implications of this high interstitial incorporation fraction and its possible relationship to x-ray diffraction and photoluminescence measurements of GaP0.99Bi0.01.

  1. Nitrogen Availability Of Nitriding Atmosphere In Controlled Gas Nitriding Processes

    Directory of Open Access Journals (Sweden)

    Michalski J.

    2015-06-01

    Full Text Available Parameters which characterize the nitriding atmosphere in the gas nitriding process of steel are: the nitriding potential KN, ammonia dissociation rate α and nitrogen availabilitymN2. The article discusses the possibilities of utilization of the nitriding atmosphere’s nitrogen availability in the design of gas nitriding processes of alloyed steels in atmospheres derived from raw ammonia, raw ammonia diluted with pre-dissociated ammonia, with nitrogen, as well as with both nitrogen and pre-dissociated ammonia. The nitriding processes were accomplished in four series. The parameters selected in the particular processes were: process temperature (T, time (t, value of nitriding potential (KN, corresponding to known dissociation rate of the ammonia which dissociates during the nitriding process (α. Variable parameters were: nitrogen availability (mN2, composition of the ingoing atmosphere and flow rate of the ingoing atmosphere (FIn.

  2. Synchrotron X-Ray Fluorescence Microscopy of Gallium in Bladder Tissue following Gallium Maltolate Administration during Urinary Tract Infection

    OpenAIRE

    Ball, Katherine R.; Sampieri, Francesca; Chirino, Manuel; Hamilton, Don L.; Blyth, Robert I. R.; Sham, Tsun-Kong; Dowling, Patricia M.; Thompson, Julie

    2013-01-01

    A mouse model of cystitis caused by uropathogenic Escherichia coli was used to study the distribution of gallium in bladder tissue following oral administration of gallium maltolate during urinary tract infection. The median concentration of gallium in homogenized bladder tissue from infected mice was 1.93 μg/g after daily administration of gallium maltolate for 5 days. Synchrotron X-ray fluorescence imaging and X-ray absorption spectroscopy of bladder sections confirmed that gallium arrived ...

  3. Metal Nitrides for Plasmonic Applications

    DEFF Research Database (Denmark)

    Naik, Gururaj V.; Schroeder, Jeremy; Guler, Urcan;

    2012-01-01

    Metal nitrides as alternatives to metals such as gold could offer many advantages when used as plasmonic material. We show that transition metal nitrides can replace metals providing equally good optical performance for many plasmonic applications.......Metal nitrides as alternatives to metals such as gold could offer many advantages when used as plasmonic material. We show that transition metal nitrides can replace metals providing equally good optical performance for many plasmonic applications....

  4. The surface tension of liquid gallium

    Science.gov (United States)

    Hardy, S. C.

    1985-01-01

    The surface tension of liquid gallium has been measured using the sessile drop technique in an Auger spectrometer. The experimental method is described. The surface tension in mJ/sq m is found to decrease linearly with increasing temperature and may be represented as 708-0.66(T-29.8), where T is the temperature in centigrade. This result is of interest because gallium has been suggested as a model fluid for Marangoni flow experiments. In addition, the surface tension is of technological significance in the processing of compound semiconductors involving gallium.

  5. Development in p-type Doping of ZnO

    Institute of Scientific and Technical Information of China (English)

    YU Liping; ZHU Qiqiang; FAN Dayong; LAN Zili

    2012-01-01

    Zinc oxide (ZnO) is a wide band-gap material of the Ⅱ-Ⅵ group with excellent optical properties for optoelectronics applications,such as the flat panel displays and solar cells used in sports tournament.Despite its advantages,the application of ZnO is hampered by the lack of stable p-type doping.In this paper,the recent progress in this field was briefly reviewed,and a comprehensive summary of the research was carried out on ZnO fabrication methods and its electrical,optical,and magnetic properties were presented.

  6. P-type conductivity in annealed strontium titanate

    Energy Technology Data Exchange (ETDEWEB)

    Poole, Violet M.; Corolewski, Caleb D.; McCluskey, Matthew D., E-mail: mattmcc@wsu.edu [Department of Physics and Astronomy, Washington State University, Pullman, WA 99164-2814 (United States)

    2015-12-15

    Hall-effect measurements indicate p-type conductivity in bulk, single-crystal strontium titanate (SrTiO{sub 3}, or STO) samples that were annealed at 1200°C. Room-temperature mobilities above 100 cm{sup 2}/V s were measured, an order of magnitude higher than those for electrons (5-10 cm{sup 2}/V s). Average hole densities were in the 10{sup 9}-10{sup 10} cm{sup −3} range, consistent with a deep acceptor.

  7. Bi-Se doped with Cu, p-type semiconductor

    Science.gov (United States)

    Bhattacharya, Raghu Nath; Phok, Sovannary; Parilla, Philip Anthony

    2013-08-20

    A Bi--Se doped with Cu, p-type semiconductor, preferably used as an absorber material in a photovoltaic device. Preferably the semiconductor has at least 20 molar percent Cu. In a preferred embodiment, the semiconductor comprises at least 28 molar percent of Cu. In one embodiment, the semiconductor comprises a molar percentage of Cu and Bi whereby the molar percentage of Cu divided by the molar percentage of Bi is greater than 1.2. In a preferred embodiment, the semiconductor is manufactured as a thin film having a thickness less than 600 nm.

  8. Fabrication of p-type conductivity in SnO{sub 2} thin films through Ga doping

    Energy Technology Data Exchange (ETDEWEB)

    Tsay, Chien-Yie, E-mail: cytsay@fcu.edu.tw; Liang, Shan-Chien

    2015-02-15

    Highlights: • P-type Ga-doped SnO{sub 2} semiconductor films were prepared by sol-gel spin coating. • Optical bandgaps of the SnO{sub 2}:Ga films are narrower than that of the SnO{sub 2} film. • SnO{sub 2}:Ga films exhibited p-type conductivity as Ga doping content higher than 10%. • A p-n heterojunction composed of p-type SnO{sub 2}:Ga and n-type ZnO:Al was fabricated. - Abstract: P-type transparent tin oxide (SnO{sub 2}) based semiconductor thin films were deposited onto alkali-free glass substrates by a sol-gel spin-coating method using gallium (Ga) as acceptor dopant. In this study, we investigated the influence of Ga doping concentration ([Ga]/[Sn] + [Ga] = 0%, 5%, 10%, 15%, and 20%) on the structural, optical and electrical properties of SnO{sub 2} thin films. XRD analysis results showed that dried Ga-doped SnO{sub 2} (SnO{sub 2}:Ga) sol-gel films annealed in oxygen ambient at 520 °C for 1 h exhibited only the tetragonal rutile phase. The average optical transmittance of as-prepared thin film samples was higher than 87.0% in the visible light region; the optical band gap energy slightly decreased from 3.92 eV to 3.83 eV with increases in Ga doping content. Hall effect measurement showed that the nature of conductivity of SnO{sub 2}:Ga thin films changed from n-type to p-type when the Ga doping level was 10%, and when it was at 15%, Ga-doped SnO{sub 2} thin films exhibited the highest mean hole concentration of 1.70 × 10{sup 18} cm{sup -3}. Furthermore, a transparent p-SnO{sub 2}:Ga (Ga doping level of 15%)/n-ZnO:Al (Al doping level of 2%) heterojunction was fabricated on alkali-free glass. The I-V curve measurement for the p-n heterojunction diode showed a typical rectifying characteristic with a forward turn-on voltage of 0.65 V.

  9. Optical Design of Dilute Nitride Quantum Wells Vertical Cavity Semiconductor Optical Amplifiers for Communication Systems

    Directory of Open Access Journals (Sweden)

    Faten A. Chaqmaqchee

    2016-04-01

    Full Text Available III-V semiconductors components such as Gallium Arsenic (GaAs, Indium Antimony (InSb, Aluminum Arsenic (AlAs and Indium Arsenic (InAs have high carrier mobilities and direct energy gaps. This is making them indispensable for today’s optoelectronic devices such as semiconductor lasers and optical amplifiers at 1.3 μm wavelength operation. In fact, these elements are led to the invention of the Gallium Indium Nitride Arsenic (GaInNAs, where the lattice is matched to GaAs for such applications. This article is aimed to design dilute nitride GaInNAs quantum wells (QWs enclosed between top and bottom of Aluminum (Gallium Arsenic Al(GaAs distributed bragg mirrors (DBRs using MATLAB® program. Vertical cavity semiconductor optical amplifiers (VCSOAs structures are based on Fabry Perot (FP method to design optical gain and bandwidth gain to be operated in reflection and transmission modes. The optical model gives access to the contact layer of epitaxial structure and the reflectivity for successive radiative modes, their lasing thresholds, emission wavelengths and optical field distributions in the laser cavity.

  10. Nitride quantum light sources

    Science.gov (United States)

    Zhu, T.; Oliver, R. A.

    2016-02-01

    Prototype nitride quantum light sources, particularly single-photon emitters, have been successfully demonstrated, despite the challenges inherent in this complex materials system. The large band offsets available between different nitride alloys have allowed device operation at easily accessible temperatures. A wide range of approaches has been explored: not only self-assembled quantum dot growth but also lithographic methods for site-controlled nanostructure formation. All these approaches face common challenges, particularly strong background signals which contaminate the single-photon stream and excessive spectral diffusion of the quantum dot emission wavelength. If these challenges can be successfully overcome, then ongoing rapid progress in the conventional III-V semiconductors provides a roadmap for future progress in the nitrides.

  11. Metal Fluoride Inhibition of a P-type H+ Pump

    Science.gov (United States)

    Pedersen, Jesper Torbøl; Falhof, Janus; Ekberg, Kira; Buch-Pedersen, Morten Jeppe; Palmgren, Michael

    2015-01-01

    The plasma membrane H+-ATPase is a P-type ATPase responsible for establishing electrochemical gradients across the plasma membrane in fungi and plants. This essential proton pump exists in two activity states: an autoinhibited basal state with a low turnover rate and a low H+/ATP coupling ratio and an activated state in which ATP hydrolysis is tightly coupled to proton transport. Here we characterize metal fluorides as inhibitors of the fungal enzyme in both states. In contrast to findings for other P-type ATPases, inhibition of the plasma membrane H+-ATPase by metal fluorides was partly reversible, and the stability of the inhibition varied with the activation state. Thus, the stability of the ATPase inhibitor complex decreased significantly when the pump transitioned from the activated to the basal state, particularly when using beryllium fluoride, which mimics the bound phosphate in the E2P conformational state. Taken together, our results indicate that the phosphate bond of the phosphoenzyme intermediate of H+-ATPases is labile in the basal state, which may provide an explanation for the low H+/ATP coupling ratio of these pumps in the basal state. PMID:26134563

  12. Radiochemical separation of gallium by amalgam exchange

    Science.gov (United States)

    Ruch, R.R.

    1969-01-01

    An amalgam-exchange separation of radioactive gallium from a number of interfering radioisotopes has been developed. A dilute (ca. 0.3%) gallium amalgam is agitated with a slightly acidic solution of 72Ga3+ containing concentrations of sodium thiocyanate and either perchlorate or chloride. The amalgam is then removed and the radioactive gallium stripped by agitation with dilute nitric acid. The combined exchange yield of the perchlorate-thiocyanate system is 90??4% and that of the chloride-thiocyanate system is 75??4%. Decontamination yields of most of the 11 interfering isotopes studied were less than 0.02%. The technique is applicable for use with activation analysis for the determination of trace amounts of gallium. ?? 1969.

  13. Nanoscale photonics of structural transformations in gallium

    Science.gov (United States)

    Zheludev, Nikolay I.; Fedotov, V. A.; MacDonald, K. F.; Stevens, G. C.; Pochon, Sebastien C.; Woodford, M.

    2002-11-01

    We have found recently that Gallium, confined at an interface with silica, responds dramatically to low power optical excitation when held at temperatures close to its melting point (29.8oC). Intensities of just a few kW/cm2 can reversibly modulate the intensity (by up to 40%) and phase (by as much as several degrees) of reflected light as the result of a light-induced structural transition occurring in a layer of gallium of only a few nm thick. Here, we report that this concept - of achieving a nonlinearity via a light-induced transformation in a confined solid at a temperature close to a phase transition temperature - can also be applied to gallium nanoparticles. We present the transient all-optical switching characteristics of gallium nanoparticle films comprising particles, typically 80 nm in diameter, which were formed directly on the ends of optical fibers using a new light-assisted self-assembly technique. We also report, for the first time, that this light-induced structural transition in gallium confined at an interface with silica underlies a new mechanism for photoconductivity. In our opinion, the exploitation of the light-induced phase transition in gallium may be a means of enabling the development of nanoscale photonic devices.

  14. Adsorption of sugars on Al- and Ga-doped boron nitride surfaces: A computational study

    Energy Technology Data Exchange (ETDEWEB)

    Darwish, Ahmed A. [Center for Nanotechnology, Zewail City of Science and Technology, Giza 12588 (Egypt); Department of Nuclear and Radiation Engineering, Faculty of Engineering, Alexandria University, Alexandria (Egypt); Fadlallah, Mohamed M. [Center for Fundamental Physics, Zewail City of Science and Technology, Giza 12588 (Egypt); Department of Physics, Faculty of Science, Benha University, Benha (Egypt); Badawi, Ashraf [Center for Nanotechnology, Zewail City of Science and Technology, Giza 12588 (Egypt); Maarouf, Ahmed A., E-mail: ahmed.maarouf@egnc.gov.eg [Center for Fundamental Physics, Zewail City of Science and Technology, Giza 12588 (Egypt); Egypt Nanotechnology Center & Department of Physics, Faculty of Science, Cairo University, Giza 12613 (Egypt)

    2016-07-30

    Highlights: • Doping boron nitride sheets with aluminum or gallium atoms significantly enhances their molecular adsorption properties. • Adsorption of glucose or glucosamine on Al- and Ga-doped boron nitride sheets changes the band gap. • Doping concentration changes the bad gap, but has a minor effect on the adsorption energy. - Abstract: Molecular adsorption on surfaces is a key element for many applications, including sensing and catalysis. Non-invasive sugar sensing has been an active area of research due to its importance to diabetes care. The adsorption of sugars on a template surface study is at the heart of matter. Here, we study doped hexagonal boron nitride sheets (h-BNNs) as adsorbing and sensing template for glucose and glucosamine. Using first principles calculations, we find that the adsorption of glucose and glucosamine on h-BNNs is significantly enhanced by the substitutional doping of the sheet with Al and Ga. Including long range van der Waals corrections gives adsorption energies of about 2 eV. In addition to the charge transfer occurring between glucose and the Al/Ga-doped BN sheets, the adsorption alters the size of the band gap, allowing for optical detection of adsorption. We also find that Al-doped boron nitride sheet is better than Ga-doped boron nitride sheet to enhance the adsorption energy of glucose and glucosamine. The results of our work can be potentially utilized when designing support templates for glucose and glucosamine.

  15. p-Type NiO Hybrid Visible Photodetector.

    Science.gov (United States)

    Mallows, John; Planells, Miquel; Thakare, Vishal; Bhosale, Reshma; Ogale, Satishchandra; Robertson, Neil

    2015-12-23

    A novel hybrid visible-light photodetector was created using a planar p-type inorganic NiO layer in a junction with an organic electron acceptor layer. The effect of different oxygen pressures on formation of the NiO layer by pulsed laser deposition shows that higher pressure increases the charge carrier density of the film and lowers the dark current in the device. The addition of a monolayer of small molecules containing conjugated π systems and carboxyl groups at the device interface was also investigated and with correct alignment of the energy levels improves the device performance with respect to the quantum efficiency, responsivity, and photogeneration. The thickness of the organic layer was also optimized for the device, giving a responsivity of 1.54 × 10(-2) A W(-1) in 460 nm light.

  16. Elucidating Functional Aspects of P-type ATPases

    DEFF Research Database (Denmark)

    Autzen, Henriette Elisabeth

    2015-01-01

    similar to that of the wild type (WT) protein. The discrepancy between the newly determined crystal structure of LpCopA and the functional manifestations of the missense mutation in human CopA, could indicate that LpCopA is insufficient in structurally elucidating the effect of disease-causing mutations...... cancer and pathogenic microbes. The goal of this Ph.D. dissertation was to functionally characterize SERCA1a and CopA from Legionella pneumophila (LpCopA) through a range of different methods within structural biology. Crystallographic studies of SERCA1a led to a newly determined crystal structure......P-type ATPases are proteins that act to maintain ion homeostasis and electrochemical gradients through the translocation of cations across cell membranes. Underscoring their significance in humans, dysfunction of the ATPases can lead to crucial diseases. Dysfunction of the sarco...

  17. Study on the p-type QWIP-LED device

    Institute of Scientific and Technical Information of China (English)

    ZHEN; Honglou; XIONG; Dayuan; ZHOU; Xuchang; LI; Ning; SHAO; Jun; LU; Wei

    2006-01-01

    A p-type quantum well infrared photodetector (QWIP) integrated with a light-emitting diode (LED) (named QWIP-LED) was fabricated and studied. The infrared photo-response spectrum was obtained from the device resistance variation and the near-infrared photo-emission intensity variation. A good agreement between these two spectra was observed, which demonstrates that the long-wavelength infrared radiation around 7.5 μm has been transferred to the near-infrared light at 0.8 μm by the photo-electronic process in the QWIP-LED structure. Moreover, the experimentally observed infrared response wavelength is in good agreement with the theoretical calculation value of 7.7 μm. The results on the upconversion of the infrared radiation will be very useful for the new infrared focal plane array technology.

  18. Fluorescent lighting with aluminum nitride phosphors

    Energy Technology Data Exchange (ETDEWEB)

    Cherepy, Nerine J.; Payne, Stephen A.; Seeley, Zachary M.; Srivastava, Alok M.

    2016-05-10

    A fluorescent lamp includes a glass envelope; at least two electrodes connected to the glass envelope; mercury vapor and an inert gas within the glass envelope; and a phosphor within the glass envelope, wherein the phosphor blend includes aluminum nitride. The phosphor may be a wurtzite (hexagonal) crystalline structure Al.sub.(1-x)M.sub.xN phosphor, where M may be drawn from beryllium, magnesium, calcium, strontium, barium, zinc, scandium, yttrium, lanthanum, cerium, praseodymium, europium, gadolinium, terbium, ytterbium, bismuth, manganese, silicon, germanium, tin, boron, or gallium is synthesized to include dopants to control its luminescence under ultraviolet excitation. The disclosed Al.sub.(1-x)M.sub.xN:Mn phosphor provides bright orange-red emission, comparable in efficiency and spectrum to that of the standard orange-red phosphor used in fluorescent lighting, Y.sub.2O.sub.3:Eu. Furthermore, it offers excellent lumen maintenance in a fluorescent lamp, and does not utilize "critical rare earths," minimizing sensitivity to fluctuating market prices for the rare earth elements.

  19. Scanning proximal microscopy study of the thin layers of silicon carbide-aluminum nitride solid solution manufactured by fast sublimation epitaxy

    Directory of Open Access Journals (Sweden)

    Tománek P.

    2013-05-01

    Full Text Available The objective of the study is a growth of SiC/(SiC1−x(AlNx structures by fast sublimation epitaxy of the polycrystalline source of (SiC1−x(AlNx and their characterisation by proximal scanning electron microscopy and atomic force microscopy. For that purpose optimal conditions of sublimation process have been defined. Manufactured structures could be used as substrates for wide-band-gap semiconductor devices on the basis of nitrides, including gallium nitride, aluminum nitride and their alloys, as well as for the production of transistors with high mobility of electrons and also for creation of blue and ultraviolet light emitters (light-emitted diodes and laser diodes. The result of analysis shows that increasing of the growth temperature up to 2300 K allows carry out sublimation epitaxy of thin layers of aluminum nitride and its solid solution.

  20. Gallium-67 uptake in cutaneous lesions of mycosis fungoides

    Energy Technology Data Exchange (ETDEWEB)

    Nishimi, L.; Chen, D.C.; Ansari, A.N.; Siegel, M.E.

    1988-02-01

    The literature on gallium imaging in mycosis fungoides is limited and conflicting. A case of mycosis fungoides with increased uptake of Ga-67 in clinically noninfected skin lesions is reported. The literature regarding mycosis fungoides and gallium imaging is reviewed.

  1. Role of gallium and bone scintigraphy in disseminated coccidioidomycosis

    Energy Technology Data Exchange (ETDEWEB)

    Cohen, A.J.; Braunstein, P.; Pais, M.J.

    1984-09-01

    The osseous lesions of disseminated coccidioidomycosis may be detected by bone but not by gallium scintigraphy or vice versa. This case emphasizes the need for performing both bone and gallium scans to avoid missing potentially serious bone lesions.

  2. Hybrid p-type ZnO film and n-type ZnO nanorod p-n homo-junction for efficient photovoltaic applications

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Jong Hyun; Lee, Jun Seok; Lee, Sang Hyo; Nam, Hye Won [Novel Functional Materials and Device Lab, Department of Physics, Hanyang University, Seoul 133-791 (Korea, Republic of); Hong, Jin Pyo, E-mail: jphong@hanyang.ac.k [Novel Functional Materials and Device Lab, Department of Physics, Hanyang University, Seoul 133-791 (Korea, Republic of); Cha, Seoung Nam; Park, Young Jun; Kim, Jong Min [Samsung Advanced Institute of Technology, P.O. Box 11, 1 Suwon 440-600 (Korea, Republic of)

    2010-09-01

    Simple hybrid p-n homo-junctions using p-type ZnO thin films and n-type nanorods grown on fluorine tin oxide (FTO) substrates for photovoltaic applications are described. The ZnO nanorods (1.5 {mu}m) were synthesized via an aqueous solution method with zinc nitrate hexahydrate and hexamethylenetetramine on ZnO seed layers. The 10-nm-thick ZnO seed layers showed n-type conductivity on FTO substrates and were deposited with a sputtering-based method. After synthesizing ZnO nanorods, aluminum-nitride co-doped p-type ZnO films (200 nm) were efficiently grown using pre-activated nitrogen (N) plasma sources with an inductively-coupled dual-target co-sputtering system. The structural and electrical properties of hybrid p-n homo-junctions were investigated by scanning electron microscopy, transmittance spectrophotometry, and I-V measurements.

  3. Recycling of p-type mc-si Top Cuts into p-type mono c-Si Solar Cells

    Energy Technology Data Exchange (ETDEWEB)

    Bronsveld, P.C.P.; Manshanden, P.; Lenzmann, F.O. [ECN Solar Energy, Westerduinweg 3, P.O. Box 1, NL-1755 ZG Petten (Netherlands); Gjerstad, O. [Si Pro Holding AS, Ornesveien 3, P.O. Box 37, 8161, Glomfjord (Norway); Oevrelid, E.J. [SINTEF, Alfred Getz Vei 2, 7465, Trondheim (Norway)

    2013-07-01

    Solar cell results and material analysis are presented of 2 p-type Czochralski (Cz) ingots pulled from a charge consisting of 100% and 50% recycled multicrystalline silicon top cuts. The top cuts were pre-cleaned with a dedicated low energy consuming technology. No structure loss was observed in the bodies of the ingots. The performance of solar cells made from the 100% recycled Si ingot decreases towards the seed end of the ingot, which could be related to a non-optimal pulling process. Solar cells from the tail end of this ingot and from the 50% recycled Si ingot demonstrated an average solar cell efficiency of 18.6%. This is only 0.1% absolute lower than the efficiency of higher resistivity reference solar cells from commercially available wafers that were co-processed.

  4. Progress in III–nitrides: Process issue and purity perspective

    Indian Academy of Sciences (India)

    J Kumar

    2005-07-01

    The growth of good quality layers of gallium nitride (GaN) as suitable for epitaxial growth is of great technological importance. Chloride vapour phase epitaxy (Cl–VPE) has been employed to grow good quality layers of GaN. The grown layers have been extensively characterized for their structural and optical properties. MOVPE grown GaN layers have been used to address process issues on device structuring and fabrication. GaN samples with different transition metal dopants have been synthesized and their usefulness as semi-magnetic materials, which are also identified as dilute magnetic semiconductors (DMS), have been evaluated. Better results have been obtained on the magnetic characteristics of GaN with ruthenium as the dopant. Nano dimensional structures of GaN have been obtained with excellent control of the growth parameters.

  5. III-Nitride advanced technologies and equipment for microelectronics

    Science.gov (United States)

    Petrov, S. I.; Alexeev, A. N.; Mamaev, V. V.; Krasovitsky, D. M.; Chaly, V. P.

    2016-12-01

    Using of complex equipment SemiTEq shown in example of a closed cycle of basic technological operations for production of high-power field microwave transistors based on gallium nitride in the "Svetlana-Rost" JSC. Basic technological operations are shown: MBE growth of heterostructures, metal deposition of contacts using electron-beam evaporation system, thermal annealing of ohmic contacts, meza-isolation plasma-chemical etching and dielectric plasma deposition. The main problems during the technological route as well as ways to solve are discussed. In particular, ways to reduce the dislocation density in the active region of the transistor heterostructures grown on the mismatched substrates are described in detail. Special attention given to the homogeneity and reproducibility both after some manufacturing operations and applied to the end product.

  6. Acceptor impurity activation in III-nitride light emitting diodes

    Energy Technology Data Exchange (ETDEWEB)

    Römer, Friedhard, E-mail: froemer@uni-kassel.de; Witzigmann, Bernd, E-mail: bernd.witzigmann@uni-kassel.de [Department of Electrical Engineering, University of Kassel, 34121 Kassel (Germany)

    2015-01-12

    In this work, the role of the acceptor doping and the acceptor activation and its impact on the internal quantum efficiency (IQE) of a Gallium Nitride (GaN) based multi-quantum well light emitting diode is studied by microscopic simulation. Acceptor impurities in GaN are subject to a high activation energy which depends on the presence of proximate dopant atoms and the electric field. A combined model for the dopant ionization and activation barrier reduction has been developed and implemented in a semiconductor carrier transport simulator. By model calculations, we demonstrate the impact of the acceptor activation mechanisms on the decay of the IQE at high current densities, which is known as the efficiency droop. A major contributor to the droop is the electron leakage which is largely affected by the acceptor doping.

  7. Nitride RCLEDs grown by MBE for POF applications

    Energy Technology Data Exchange (ETDEWEB)

    Calle, F.; Naranjo, F.B.; Fernandez, S.; Sanchez-Garcia, M.A.; Calleja, E.; Munoz, E. [ISOM and Departamento de Ingenieria Electronica, ETSI de Telecomunicacion, Universidad Politecnica de Madrid, Ciudad Universitaria, 28040 Madrid (Spain)

    2002-08-16

    Data links by means of plastic optical fibres (POF) demand efficient light emitting diodes (LEDs) at 510 nm, the most promising candidate being nitride-based resonant-cavity LEDs (RCLEDs). These devices include InGaN/GaN multiple-quantum-well (MQW) structures, and GaN/AlGaN distributed Bragg reflectors. Molecular beam epitaxy (MBE) offers some advantages for the fabrication of nitride RCLEDs, like high In incorporation in the active region, and control of the interface quality in the mirror. The main steps in the development of nitride-based RCLEDs using radio-frequency plasma-assisted MBE are addressed, with emphasis in a) p-type doping of GaN by MBE; b) the optimisation of growth, the design and characterisation of AlGaN/GaN stacks for a reflector in the micro-cavity; and c) the growth of InGaN layers, InGaN/GaN MQWs, and conventional InGaN LEDs, which are studied by structural, electrical and optical techniques. The design and fabrication of nitride RCLEDs, which satisfy spectral and thermal specifications for POF applications, are finally described. (Abstract Copyright[2002], Wiley Periodicals, Inc.)

  8. (Ga,Fe)Sb: A p-type ferromagnetic semiconductor

    Energy Technology Data Exchange (ETDEWEB)

    Tu, Nguyen Thanh; Anh, Le Duc; Tanaka, Masaaki [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656 (Japan); Hai, Pham Nam [Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656 (Japan); Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo 152-0033 (Japan)

    2014-09-29

    A p-type ferromagnetic semiconductor (Ga{sub 1−x},Fe{sub x})Sb (x = 3.9%–13.7%) has been grown by low-temperature molecular beam epitaxy (MBE) on GaAs(001) substrates. Reflection high energy electron diffraction patterns during the MBE growth and X-ray diffraction spectra indicate that (Ga,Fe)Sb layers have the zinc-blende crystal structure without any other crystallographic phase of precipitates. Magnetic circular dichroism (MCD) spectroscopy characterizations indicate that (Ga,Fe)Sb has the zinc-blende band structure with spin-splitting induced by s,p-d exchange interactions. The magnetic field dependence of the MCD intensity and anomalous Hall resistance of (Ga,Fe)Sb show clear hysteresis, demonstrating the presence of ferromagnetic order. The Curie temperature (T{sub C}) increases with increasing x and reaches 140 K at x = 13.7%. The crystal structure analyses, magneto-transport, and magneto-optical properties indicate that (Ga,Fe)Sb is an intrinsic ferromagnetic semiconductor.

  9. Infrared Transparent Spinel Films with p -Type Conductivity

    Energy Technology Data Exchange (ETDEWEB)

    Windisch, Charles F.; Exarhos, Gregory J.; Ferris, Kim F.; Engelhard, Mark H.; Stewart, Donald C.

    2001-11-29

    Spinel oxide films containing at least two transition metal cations were found to exhibit p-type conductivity with high optical transparency from the visible to wavelengths near 15 micrometers. Resistivities as low as 0.003 ohm-cm were measured on 100 nm thick rf sputter deposited films that contained nickel and cobalt. Optical spectra, Raman scattering and XPS measurements indicated the valency of nickel localized on octahedral sites within the spinel lattice determines these properties. Electronic band structure calculations corroborated the experimental results. A resistivity minimum was found at the composition NiCo2O4 deposited from aqueous or alcoholic solutions followed by subsequent annealing at 400 degrees C in air. Solution deposited films richer in nickel than this stoichiometry always were found to phase separate into nickel oxide and a spinel phase with concomitant loss in conductivity. However, the phase stability region could be extended to higher nickel contents when rf-sputter deposition techniques were used. Sputter deposited spinel films having a nickel to cobalt ratio less than 2 were found to exhibit the highest conductivity. Results suggest that the phase stability region for these materials can be extended through appropriate choice of deposition conditions. A possible mechanism that promotes high conductivity in this system is thought to be charge transfer between the resident di- and trivalent cations that may be assisted by the magnetic nature of the oxide film.

  10. Electronic processes in uniaxially stressed p-type germanium

    Energy Technology Data Exchange (ETDEWEB)

    Dubon, Jr., Oscar Danilo [Univ. of California, Berkeley, CA (United States)

    1996-02-01

    Effect of uniaxial stress on acceptor-related electronic processes in Ge single crystals doped with Ga, Be, and Cu were studied by Hall and photo-Hall effect measurements in conjunction with infrared spectroscopy. Stress dependence of hole lifetime in p-type Ge single crystals is used as a test for competing models of non-radiative capture of holes by acceptors. Photo-Hall effect shows that hole lifetime in Ga- and Be-doped Ge increases by over one order of magnitude with uniaxial stress at liq. He temps. Photo-Hall of Ge:Be shows a stress-induced change in the temperature dependence of hole lifetime. This is consistent with observed increase of responsivity of Ge:Ga detectors with uniaxial stress. Electronic properties of Ge:Cu are shown to change dramatically with uniaxial stress; the results provide a first explanation for the performance of uniaxially stressed, Cu-diffused Ge:Ga detectors which display a high conductivity in absence of photon signal and therefore have poor sensitivity.

  11. P type porous silicon resistivity and carrier transport

    Energy Technology Data Exchange (ETDEWEB)

    Ménard, S., E-mail: samuel.menard@st.com [STMicroelectronics, 10, rue Thalès de Milet, 37071 Tours Cedex 2 (France); Fèvre, A. [STMicroelectronics, 10, rue Thalès de Milet, 37071 Tours Cedex 2 (France); Université François Rabelais de Tours, CNRS, CEA, INSA CVL, GREMAN UMR 7347, Tours (France); Billoué, J.; Gautier, G. [Université François Rabelais de Tours, CNRS, CEA, INSA CVL, GREMAN UMR 7347, Tours (France)

    2015-09-14

    The resistivity of p type porous silicon (PS) is reported on a wide range of PS physical properties. Al/PS/Si/Al structures were used and a rigorous experimental protocol was followed. The PS porosity (P{sub %}) was found to be the major contributor to the PS resistivity (ρ{sub PS}). ρ{sub PS} increases exponentially with P{sub %}. Values of ρ{sub PS} as high as 1 × 10{sup 9} Ω cm at room temperature were obtained once P{sub %} exceeds 60%. ρ{sub PS} was found to be thermally activated, in particular, when the temperature increases from 30 to 200 °C, a decrease of three decades is observed on ρ{sub PS}. Based on these results, it was also possible to deduce the carrier transport mechanisms in PS. For P{sub %} lower than 45%, the conduction occurs through band tails and deep levels in the tissue surrounding the crystallites. When P{sub %} overpasses 45%, electrons at energy levels close to the Fermi level allow a hopping conduction from crystallite to crystallite to appear. This study confirms the potential of PS as an insulating material for applications such as power electronic devices.

  12. EDITORIAL: Non-polar and semipolar nitride semiconductors Non-polar and semipolar nitride semiconductors

    Science.gov (United States)

    Han, Jung; Kneissl, Michael

    2012-02-01

    topics including growth and heteroepitaxy, bulk GaN substrates, theory and modelling, optical properties, laser diodes and LEDs as well as transport properties and electronics. Farrell et al review materials and growth issues for high-performance non- and semipolar light-emitting devices, and Scholz provides an overview of heteroepitaxial growth of semipolar GaN. Okada et al review growth mechanisms of non- and semipolar GaN layers on patterned sapphire substrates, and Vennéguès discusses defect reduction methods for heteroepitaxially grown non- and semipolar III-nitride films. Leung et al explain how kinetic Wulff plots can be used to design and control non-polar and semipolar GaN heteroepitaxy, and a contribution by Sawaki et al explores the impurity incorporation in (1-101) GaN grown on Si substrates. In the area of bulk crystal growth Kucharski et al review non- and semipolar GaN substrates by ammonothermal growth, and Chichibu et al discuss the challenges for epitaxial growth of InGaN on free-standing m-plane GaN substrates. Calculation of semipolar orientations for wurtzitic semiconductor heterostructures and their application to nitrides and oxides are reviewed by Bigenwald et al, and Ito et al present an ab initio approach to reconstruction, adsorption, and incorporation on GaN surfaces. Finally, the theoretical description of non-polar and semipolar nitride semiconductor quantum-well structures is presented by Ahn et al. In a discussion of the optical properties, Kisin et al discuss the effect of the quantum well population on the optical characteristics of polar, semipolar and non-polar III-nitride light emitters, and Jönen et al investigate the indium incorporation and optical properties of non- and semipolar GaInN QW structures. Wernicke et al explore the emission wavelength of polar, non-polar, and semipolar InGaN quantum wells and the incorporation of indium. In a contribution by Melo et al, the gain in polar and non-polar/semipolar gallium-nitride

  13. Development of a Multi-layer Anti-reflective Coating for Gallium Arsenide/Aluminum Gallium Arsenide Solar Cells

    Science.gov (United States)

    2015-07-01

    Aluminum Gallium Arsenide Solar Cells by Kimberley A Olver Approved for public release; distribution unlimited...Development of a Multi-layer Anti-reflective Coating for Gallium Arsenide/Aluminum Gallium Arsenide Solar Cells by Kimberley A Olver...Aluminum Gallium Arsenide (AlGaAs) Solar Cells 5a. CONTRACT NUMBER 5b. GRANT NUMBER 5c. PROGRAM ELEMENT NUMBER 6. AUTHOR(S) Kimberley A Olver

  14. Analysis of plasma nitrided steels

    Science.gov (United States)

    Salik, J.; Ferrante, J.; Honecy, F.; Hoffman, R., Jr.

    1987-01-01

    The analysis of plasma nitrided steels can be divided to two main categories - structural and chemical. Structural analysis can provide information not only on the hardening mechanisms but also on the fundamental processes involved. Chemical analysis can be used to study the kinetics for the nitriding process and its mechanisms. In this paper preliminary results obtained by several techniques of both categories are presented and the applicability of those techniques to the analysis of plasma-nitrided steels is discussed.

  15. Fatigue modelling for gas nitriding

    Directory of Open Access Journals (Sweden)

    H. Weil

    2016-10-01

    Full Text Available The present study aims to develop an algorithm able to predict the fatigue lifetime of nitrided steels. Linear multi-axial fatigue criteria are used to take into account the gradients of mechanical properties provided by the nitriding process. Simulations on rotating bending fatigue specimens are made in order to test the nitrided surfaces. The fatigue model is applied to the cyclic loading of a gear from a simulation using the finite element software Ansys. Results show the positive contributions of nitriding on the fatigue strength

  16. Titanium Nitride Cermets

    Science.gov (United States)

    1952-07-01

    C ermets 7 Effect of Amount of Metal on Strength of TiN-Ni-Cr....26 Cerme ts S Effect of Amount of Metal on Strength of TiN-Co-Cr....27 Cermets 9...Figures 7 and 8. Titanium Nitride-Nickel-Chromium Cerme ts From Figure 7, it can be seen that 2900OF was the better firing temperature. The 20% metal

  17. Gallium-67 scintigraphy in patients with hemochromatosis treated by deferoxamine

    Energy Technology Data Exchange (ETDEWEB)

    Nagamachi, Shigeki; Hoshi, Hiroaki; Jinnouchi, Seishi; Ono, Seiji; Watanabe, Katsushi

    1988-05-01

    Gallium scintigraphy was performed as an aid for determining the presence or absence of malignant neoplasm in two patients with hemochromatosis treated by deferoxamine. However, gallium scan images could not be obtained. So gallium scintigraphy was performed once more to investigate the cause of low activity. Both patients had heavy urinary excretion of gallium in the first 24 hrs after the injection, and activity was very low on the day of examination. This phenomenon may be attributed to the effect of deferoxamine which is highly bound to the gallium.

  18. A modern perspective on the history of semiconductor nitride blue light sources

    Science.gov (United States)

    Maruska, Herbert Paul; Rhines, Walden Clark

    2015-09-01

    In this paper we shall discuss the development of blue light-emitting (LED) and laser diodes (LD), starting early in the 20th century. Various materials systems were investigated, but in the end, the nitrides of aluminum, gallium and indium proved to be the most effective. Single crystal thin films of GaN first emerged in 1968. Blue light-emitting diodes were first reported in 1971. Devices grown in the 1970s were prepared by the halide transport method, and were never efficient enough for commercial products due to contamination. Devices created by metal-organic vapor-phase epitaxy gave far superior performance. Actual true blue LEDs based on direct band-to-band transitions, free of recombination through deep levels, were finally developed in 1994, leading to a breakthrough in LED performance, as well as nitride based laser diodes in 1996. In 2014, the scientists who achieved these critical results were awarded the Nobel Prize in Physics.

  19. Plasmonic Titanium Nitride Nanostructures via Nitridation of Nanopatterned Titanium Dioxide

    DEFF Research Database (Denmark)

    Guler, Urcan; Zemlyanov, Dmitry; Kim, Jongbum

    2017-01-01

    Plasmonic titanium nitride nanostructures are obtained via nitridation of titanium dioxide. Nanoparticles acquired a cubic shape with sharper edges following the rock-salt crystalline structure of TiN. Lattice constant of the resulting TiN nanoparticles matched well with the tabulated data. Energ...

  20. Chlorine and gallium solar neutrino experiments

    Science.gov (United States)

    Bahcall, J. N.; Cleveland, B. T.; Davis, R., Jr.; Rowley, J. K.

    1985-05-01

    The authors reevaluate the expected capture rates and their uncertainties for the chlorine and gallium solar neutrino experiments using improved laboratory data and new theoretical calculations. They also derive a minimum value for the flux of solar neutrinos that is expected provided only (1) that the sun is currently producing energy by fusing light nuclei at the rate that it is emitting energy in the form of photons from its surface and (2) that nothing happens to solar neutrinos on their way to earth. These results are used - together with Monte Carlo simulations - to determine how much gallium is required for a solar neutrino experiment.

  1. Platinum nitride with fluorite structure

    Energy Technology Data Exchange (ETDEWEB)

    Yu, Rong; Zhang, Xiao-Feng

    2005-01-31

    The mechanical stability of platinum nitride has been studied using first-principles calculations. By calculating the single-crystal elastic constants, we show that platinum nitride can be stabilized in the fluorite structure, in which the nitrogen atoms occupy all the tetrahedral interstitial sites of the metal lattice. The stability is attributed to the pseudogap effect from analysis of the electronic structure.

  2. Electrochemical nitridation of metal surfaces

    Science.gov (United States)

    Wang, Heli; Turner, John A.

    2015-06-30

    Electrochemical nitridation of metals and the produced metals are disclosed. An exemplary method of electrochemical nitridation of metals comprises providing an electrochemical solution at low temperature. The method also comprises providing a three-electrode potentiostat system. The method also comprises stabilizing the three-electrode potentiostat system at open circuit potential. The method also comprises applying a cathodic potential to a metal.

  3. Synchrotron X-ray fluorescence microscopy of gallium in bladder tissue following gallium maltolate administration during urinary tract infection.

    Science.gov (United States)

    Ball, Katherine R; Sampieri, Francesca; Chirino, Manuel; Hamilton, Don L; Blyth, Robert I R; Sham, Tsun-Kong; Dowling, Patricia M; Thompson, Julie

    2013-11-01

    A mouse model of cystitis caused by uropathogenic Escherichia coli was used to study the distribution of gallium in bladder tissue following oral administration of gallium maltolate during urinary tract infection. The median concentration of gallium in homogenized bladder tissue from infected mice was 1.93 μg/g after daily administration of gallium maltolate for 5 days. Synchrotron X-ray fluorescence imaging and X-ray absorption spectroscopy of bladder sections confirmed that gallium arrived at the transitional epithelium, a potential site of uropathogenic E. coli infection. Gallium and iron were similarly but not identically distributed in the tissues, suggesting that at least some distribution mechanisms are not common between the two elements. The results of this study indicate that gallium maltolate may be a suitable candidate for further development as a novel antimicrobial therapy for urinary tract infections caused by uropathogenic E. coli.

  4. Synchrotron X-Ray Fluorescence Microscopy of Gallium in Bladder Tissue following Gallium Maltolate Administration during Urinary Tract Infection

    Science.gov (United States)

    Sampieri, Francesca; Chirino, Manuel; Hamilton, Don L.; Blyth, Robert I. R.; Sham, Tsun-Kong; Dowling, Patricia M.; Thompson, Julie

    2013-01-01

    A mouse model of cystitis caused by uropathogenic Escherichia coli was used to study the distribution of gallium in bladder tissue following oral administration of gallium maltolate during urinary tract infection. The median concentration of gallium in homogenized bladder tissue from infected mice was 1.93 μg/g after daily administration of gallium maltolate for 5 days. Synchrotron X-ray fluorescence imaging and X-ray absorption spectroscopy of bladder sections confirmed that gallium arrived at the transitional epithelium, a potential site of uropathogenic E. coli infection. Gallium and iron were similarly but not identically distributed in the tissues, suggesting that at least some distribution mechanisms are not common between the two elements. The results of this study indicate that gallium maltolate may be a suitable candidate for further development as a novel antimicrobial therapy for urinary tract infections caused by uropathogenic E. coli. PMID:23877680

  5. Synergistic Extraction of Gallium for Sulfate Solution

    Institute of Scientific and Technical Information of China (English)

    DENGTong; HUANGLijuan; 等

    2002-01-01

    A novel extractant mixture, di-2-ethylhexyl phosphate (DEHPA) plus HX, was propose and tested for recovering gallium from sulfate solution.It was found that the extraction capacity of DEPHA for gallium from sulfate solution could be enhanced significantly due to the synergistic effect of acidix extractant HX. Gallium extraction is negligible below pH 0 and highly sensitive to pH of aqueous phase in the range from 0 to 1, and satisfactory extraction can be gained at pH>1. More than 96% Ga extraction was obtained using 15% DEHPA plus 2% HX. Although Fe(Ⅲ) was found to be extracted preferentially to Ga (Ⅲ), effective extraction of Ga (Ⅲ) was possible by reducing ferric to the ferrous state prior to extraction. A loaded organic phase containing 0.48g·L-1 Ga could be produced from solution of 0.12g·L-1 Ga at A/O ratio of 4:1 via three mixer-settler operation stages. Gallium was stripped quantitatively from the loaded organic phase with 1.5mol·L-1 of sulfuric acid.

  6. Anisotropy of the magnetic susceptibility of gallium

    Science.gov (United States)

    Pankey, T.

    1960-01-01

    The bulk magnetic susceptibilities of single gallium crystals and polycrystalline gallium spheres were measured at 25??C. The following anisotropic diamagnetic susceptibilities were found: a axis (-0.119??0. 001)??10-6 emu/g, b axis (-0.416??0.002)??10 -6 emu/g, and c axis (-0.229??0.001) emu/g. The susceptibility of the polycrystalline spheres, assumed to be the average value for the bulk susceptibility of gallium, was (-0.257??0.003)??10-6 emu/g at 25??C, and (-0.299??0.003)??10-6 emu/g at -196??C. The susceptibility of liquid gallium was (0.0031??0.001) ??10-6 emu/g at 30??C and 100??C. Rotational diagrams of the susceptibilities in the three orthogonal planes of the unit cell were not sinusoidal. The anisotropy in the single crystals was presumably caused by the partial overlap of Brillouin zone boundaries by the Fermi-energy surface. The large change in susceptibility associated with the change in state was attributed to the absence of effective mass influence in the liquid state. ?? 1960 The American Institute of Physics.

  7. Functionalized boron nitride nanotubes

    Science.gov (United States)

    Sainsbury, Toby; Ikuno, Takashi; Zettl, Alexander K

    2014-04-22

    A plasma treatment has been used to modify the surface of BNNTs. In one example, the surface of the BNNT has been modified using ammonia plasma to include amine functional groups. Amine functionalization allows BNNTs to be soluble in chloroform, which had not been possible previously. Further functionalization of amine-functionalized BNNTs with thiol-terminated organic molecules has also been demonstrated. Gold nanoparticles have been self-assembled at the surface of both amine- and thiol-functionalized boron nitride Nanotubes (BNNTs) in solution. This approach constitutes a basis for the preparation of highly functionalized BNNTs and for their utilization as nanoscale templates for assembly and integration with other nanoscale materials.

  8. Gallium 67 scintigraphy in glomerular disease

    Energy Technology Data Exchange (ETDEWEB)

    Bakir, A.A.; Lopez-Majano, V.; Levy, P.S.; Rhee, H.L.; Dunea, G.

    1988-12-01

    To evaluate the diagnostic usefulness of gallium 67 scintigraphy in glomerular disease, 45 patients with various glomerulopathies, excluding lupus nephritis and renal vasculitis, were studied. Persistent renal visualization 48 hours after the gallium injection, a positive scintigram, was graded as + (less than), ++ (equal to), and +++ (greater than) the hepatic uptake. Positive scintigrams were seen in ten of 16 cases of focal segmental glomerulosclerosis, six of 11 cases of proliferative glomerulonephritis, and one case of minimal change, and one of two cases of membranous nephropathy; also in three of six cases of sickle glomerulopathy, two cases of diabetic neuropathy, one of two cases of amyloidosis, and one case of mild chronic allograft rejection. The 25 patients with positive scans were younger than the 20 with negative scans (31 +/- 12 v 42 +/- 17 years; P less than 0.01), and exhibited greater proteinuria (8.19 +/- 7.96 v 2.9 +/- 2.3 S/d; P less than 0.01) and lower serum creatinine values (2 +/- 2 v 4.1 +/- 2.8 mg/dL; P less than 0.01). The amount of proteinuria correlated directly with the intensity grade of the gallium image (P less than 0.02), but there was no correlation between the biopsy diagnosis and the outcome of the gallium scan. It was concluded that gallium scintigraphy is not useful in the differential diagnosis of the glomerular diseases under discussion. Younger patients with good renal function and heavy proteinuria are likely to have a positive renal scintigram regardless of the underlying glomerulopathy.

  9. Effects of Aqueous Vapour Consistence in Nitriding Furnace on the Quality of the Sintered Nitride

    Institute of Scientific and Technical Information of China (English)

    WANGZijiang

    1998-01-01

    If the aqueous vapour consistence is too high(>0.7%),it is very disadvantageous to the sintered products in the nitriding furnace,when silcon nitride bonded silicon carbide products are synthesized by nitridation of silicon.

  10. Ultraviolet light-emitting diodes with polarization-doped p-type layer

    Science.gov (United States)

    Hu, Wenxiao; Qin, Ping; Song, Weidong; Zhang, Chongzhen; Wang, Rupeng; Zhao, Liangliang; Xia, Chao; Yuan, Songyang; Yin, Yian; Li, Shuti

    2016-09-01

    We report ultraviolet light emitting diode (LEDs) with polarization doped p-type layer. Fabricated LEDs with polarization doped p-type layer exhibited reduced forward voltage and enhanced light output power, compared to those with traditional p-type AlGaN layer. The improvement is attributed to improved hole concentration and the smooth valence band by the polarization enhanced p-type doping. Our simulated results reveal that this p-type layer can further enhance the performance of ultraviolet LEDs by removing the electron blocking layer (EBL).

  11. Novel nitrogen/gallium precursor [Ga(bdma)H2] for MOVPE

    Science.gov (United States)

    Sterzer, E.; Beyer, A.; Nattermann, L.; Schorn, W.; Schlechter, K.; Pulz, S.; Sundermeyer, J.; Stolz, W.; Volz, K.

    2016-11-01

    Dilute nitrogen (N) containing III/V semiconductors are promising candidates for solar cell and laser applications. The N incorporation efficiency of 1,1-dimethylhydrazine (UMDHy) in metal organic vapor phase epitaxy (MOVPE), however, happens to be only in the one percentage range and below. This leads to an extremely high offer of UDMHy in the MOVPE reactor and, therefore, a drastic change in the growth conditions. Furthermore, the device efficiency of dilute nitride materials is currently hampered by carbon (C) incorporation, which is believed to be incorporated either jointly with the N from the dimethylamine radical of the UMDHy or from short hydrocarbon radicals originating from the decomposition of the other metal organics. Therefore, this work presents a novel N precursor N,N'-Bis(dimethylamino)acetamidinato-galliumdihydride [Ga(bdma)H2], which provides not only N but also gallium (Ga) during MOVPE. The direct N-Ga bond in this molecule might facilitate the N incorporation and hence increase the efficiency. For a systematic N incorporation study Ga(NAs)/GaAs heterostructures were grown by MOVPE. The N content was determined via high resolution X-ray diffraction and photoluminescence (PL) studies. Good structural quality and as grown room temperature PL were obtained. It will be also shown that the N incorporation efficiency in GaAs using [Ga(bdma)H2] is significantly higher than for growths using UDMHy under comparable conditions, making this class of molecules promising candidates for the growth of dilute nitride materials.

  12. Study of the Active Screen Plasma Nitriding

    Institute of Scientific and Technical Information of China (English)

    Zhao Cheng; C. X. Li; H. Dong; T. Bell

    2004-01-01

    Active screen plasma nitriding (ASPN) is a novel nitriding process, which overcomes many of the practical problems associated with the conventional DC plasma nitriding (DCPN). Experimental results showed that the metallurgical characteristics and hardening effect of 722M24 steel nitrided by ASPN at both floating potential and anodic (zero) potential were similar to those nitrided by DCPN. XRD and high-resolution SEM analysis indicated that iron nitride particles with sizes in sub-micron scale were deposited on the specimen surface in AS plasma nitriding. These indicate that the neutral iron nitride particles, which are sputtered from the active screen and transferred through plasma to specimen surface, are considered to be the dominant nitrogen carder in ASPN. The OES results show that NH could not be a critical species in plasma nitriding.

  13. Boron nitride converted carbon fiber

    Science.gov (United States)

    Rousseas, Michael; Mickelson, William; Zettl, Alexander K.

    2016-04-05

    This disclosure provides systems, methods, and apparatus related to boron nitride converted carbon fiber. In one aspect, a method may include the operations of providing boron oxide and carbon fiber, heating the boron oxide to melt the boron oxide and heating the carbon fiber, mixing a nitrogen-containing gas with boron oxide vapor from molten boron oxide, and converting at least a portion of the carbon fiber to boron nitride.

  14. Hemocompatibility of titanium nitride.

    Science.gov (United States)

    Dion, I; Baquey, C; Candelon, B; Monties, J R

    1992-10-01

    The left ventricular assist device is based on the principle of the Maillard-Wenkel rotative pump. The materials which make up the pump must present particular mechanical, tribological, thermal and chemical properties. Titanium nitride (TiN) because of its surface properties and graphite because of its bulk characteristics have been chosen. The present study evaluated the in vitro hemocompatibility of TiN coating deposited by the chemical vapor deposition process. Protein adsorption, platelet retention and hemolysis tests have been carried out. In spite of some disparities, the TiN behavior towards albumin and fibrinogen is interesting, compared with the one of a reference medical grade elastomer. The platelet retention test gives similar results as those achieved with the same elastomer. The hemolysis percentage is near to zero. TiN shows interesting characteristics, as far as mechanical and tribological problems are concerned, and presents very encouraging blood tolerability properties.

  15. Charge carrier transport properties in layer structured hexagonal boron nitride

    Directory of Open Access Journals (Sweden)

    T. C. Doan

    2014-10-01

    Full Text Available Due to its large in-plane thermal conductivity, high temperature and chemical stability, large energy band gap (˜ 6.4 eV, hexagonal boron nitride (hBN has emerged as an important material for applications in deep ultraviolet photonic devices. Among the members of the III-nitride material system, hBN is the least studied and understood. The study of the electrical transport properties of hBN is of utmost importance with a view to realizing practical device applications. Wafer-scale hBN epilayers have been successfully synthesized by metal organic chemical deposition and their electrical transport properties have been probed by variable temperature Hall effect measurements. The results demonstrate that undoped hBN is a semiconductor exhibiting weak p-type at high temperatures (> 700 °K. The measured acceptor energy level is about 0.68 eV above the valence band. In contrast to the electrical transport properties of traditional III-nitride wide bandgap semiconductors, the temperature dependence of the hole mobility in hBN can be described by the form of μ ∝ (T/T0−α with α = 3.02, satisfying the two-dimensional (2D carrier transport limit dominated by the polar optical phonon scattering. This behavior is a direct consequence of the fact that hBN is a layer structured material. The optical phonon energy deduced from the temperature dependence of the hole mobility is ħω = 192 meV (or 1546 cm-1, which is consistent with values previously obtained using other techniques. The present results extend our understanding of the charge carrier transport properties beyond the traditional III-nitride semiconductors.

  16. Applying bacterial metallophores to mobilize gallium

    Science.gov (United States)

    Schwabe, Ringo; Obst, Britta; Mehnert, Marika; Tischler, Dirk; Wiche, Oliver

    2017-04-01

    Metallophores are produced by many organisms such as bacteria, fungi and plants in order to mobilize metals, especially iron (Greek: "siderophore" = iron carrier), to overcome limitations or stress. Respectively, it is well known these compounds loaded with relevant metal ions are used not only by the producing organism but also by others. Thus metallophores as metal carriers are relevant for many processes at various habitats (e.g. metal acquisition, pathogenic factors, antimicrobial activity, sensing). However, metallophores do also mobilize metals of industrial interest which have no critical role in the living world. Here we focused on gallium as industrial relevant metal and compared it to iron which is important for all organisms. The herein described mobilization of valuable metals such as gallium from soils provides first hints towards alternative strategies, such as phytomining, sensor development, or solvent extraction based on metallophores. Two produced metallophore preparations of soil bacteria (Gordonia rubripertincta CWB2 and Paracoccus denitrificans PD1222) and the commercially available metallophore desferrioxamine B were analyzed for iron binding activity by means of a standard chromazurol S assay and equal iron binding activities were employed to treat a soil sample. The pH was set constant to 6 in order to avoid pH related effects. Therefore, the metallophore was prepared in a special medium and control of water and medium were also applied onto the soil. The soil was washed and incubated with the mentioned preparations. The mobilization of iron and gallium was determined prior and after the treatment by means of ICP-MS. Water showed no effect and medium only a little on metal mobilization which is related to its ionic strength. All metallophores mobilized iron at a similar strength but showed significant differences in case of gallium. Here the metallophore mix produced by strain CWB2 showed best results and allowed to mobilize gallium 3-times

  17. CdS-Free p-Type Cu2ZnSnSe4/Sputtered n-Type In x Ga1- x N Thin Film Solar Cells

    Science.gov (United States)

    Chen, Wei-Liang; Kuo, Dong-Hau; Tuan, Thi Tran Anh

    2017-03-01

    Cu2ZnSnSe4 (CZTSe) films for solar cell devices were fabricated by sputtering with a Cu-Zn-Sn metal target, followed by two-step post-selenization at 500-600°C for 1 h in the presence of single or double compensation discs to supply Se vapor. After that, two kinds of n-type III-nitride bilayers were prepared by radio frequency sputtering for CdS-free CZTSe thin film solar cell devices: In0.15Ga0.85N/GaN/CZTSe and In0.15Ga0.85N/In0.3Ga0.7N/CZTSe. The p-type CZTSe and the n-type In x Ga1- x N films were characterized. The properties of CZTSe changed with the selenization temperature and the In x Ga1- x N with its indium content. With the CdS-free modeling for a solar cell structure, the In0.15Ga0.85N/In0.3Ga0.7N/CZTSe solar cell device had an improved efficiency of 4.2%, as compared with 1.1% for the conventional design with the n-type conventional ZnO/CdS bilayer. Current density of ˜48 mA/cm2, the maximum open-circuit voltage of 0.34 V, and fill factor of 27.1% are reported. The 3.8-fold increase in conversion efficiency for the CZTSe thin film solar cell devices by replacing n-type ZnO/CdS with the III-nitride bilayer proves that sputtered III-nitride films have their merits.

  18. Leachability of nitrided ilmenite in hydrochloric acid

    CSIR Research Space (South Africa)

    Swanepoel, JJ

    2010-10-01

    Full Text Available Titanium nitride in upgraded nitrided ilmenite (bulk of iron removed) can selectively be chlorinated to produce titanium tetrachloride. Except for iron, most other components present during this low temperature (ca. 200 °C) chlorination reaction...

  19. Plasmonic titanium nitride nanostructures for perfect absorbers

    DEFF Research Database (Denmark)

    Guler, Urcan; Li, Wen-Wei; Kinsey, Nathaniel

    2013-01-01

    We propose a metamaterial based perfect absorber in the visible region, and investigate the performance of titanium nitride as an alternative plasmonic material. Numerical and experimental results reveal that titanium nitride performs better than gold as a plasmonic absorbing material...

  20. Study of swift (100 MeV) Fe{sup 9+} ion irradiated gallium antimonide

    Energy Technology Data Exchange (ETDEWEB)

    Jadhav, Vidya [Department of Physics, University of Mumbai, Santacruz (E), Mumbai 400 098 (India); Dubey, S.K. [Department of Physics, University of Mumbai, Santacruz (E), Mumbai 400 098 (India)], E-mail: skdubey@physics.mu.ac.in; Dubey, R.L.; Tripathi, S.; Yadav, A.D.; Gupta, S.J. [Department of Physics, University of Mumbai, Santacruz (E), Mumbai 400 098 (India); Gundu Rao, T.K. [SAIF, Indian Institute of Technology, Powai, Mumbai 400 076 (India); Kanjilal, D. [Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110 067 (India)

    2008-04-15

    The effect of 100 MeV irradiation of iron ions in p-type gallium antimonide for ion fluences varying from 1 x 10{sup 11} to 5 x 10{sup 13} cm{sup -2} was investigated using Raman scattering, Fourier transform infrared and X-ray diffraction measurements. Raman spectra showed a strong peak at 232.82 cm{sup -1} (LO) and a weak peak at 223.79 cm{sup -1} (TO). The peaks were shifted towards higher wave number compared to non-irradiated sample indicating the presence of stress in the irradiated samples. The increase of optical absorbance of samples irradiated with different fluences indicates the increase in the amount of disorder and defect concentrations with fluence. The intensity of the XRD peak (2{theta} = 61.07 degree) of the irradiated samples for (4 0 0) reflections was found to decrease with ion fluence.

  1. Myopericarditis in acquired immunodeficiency syndrome diagnosed by gallium scintigraphy

    Energy Technology Data Exchange (ETDEWEB)

    Cregler, L.L.; Sosa, I.; Ducey, S.; Abbey, L. (Bronx VA Medical Center, NY (USA))

    1990-07-01

    Myocarditis is among the cardiac complications of acquired immunodeficiency syndrome and, yet, is often not discovered until autopsy. Gallium scintigraphy has been employed in diagnosing this entity, but few data are available about its diagnostic accuracy and value. Here, the authors report two cases of myopericarditis as diagnosed by gallium scan.

  2. Two octanuclear gallium metallamacrocycles of topologically different connectivities.

    Science.gov (United States)

    Park, Mira; John, Rohith P; Moon, Dohyun; Lee, Kyungjin; Kim, Ghyung Hwa; Lah, Myoung Soo

    2007-12-14

    Two topologically different metallamacrocycles--S8 symmetric octanuclear gallium(III) metalladiazamacrocycle and pseudo-D4 symmetric octanuclear gallium(III) metalladiazamacrocycle--could be prepared using two similar heteroditopic bridging ligands having asymmetrical tridentate-bidentate binding residues.

  3. Benchmarking of Evaluated Neutron Data for Gallium Sample

    Institute of Scientific and Technical Information of China (English)

    HAN; Rui; NIE; Yang-bo; RUAN; Xi-chao; BAO; Jie; REN; Jie; HUANG; Han-xiong; LI; Xia; ZHANG; Kai; ZHOU; Zu-ying

    2013-01-01

    Gallium(Ga)is a kind of target material and an important fission product.It has the characteristics of low melting point and high boiling point.The integral experimental study on Gallium data is an important issue.It has an important application for design of reactors and ADS(Accelerator Driven System)

  4. Cathodic Cage Plasma Nitriding: An Innovative Technique

    OpenAIRE

    Sousa,R.R.M.; de Araújo, F. O.; J. A. P. da Costa; Brandim,A.S.; R. A. de Brito; C. Alves

    2012-01-01

    Cylindrical samples of AISI 1020, AISI 316, and AISI 420 steels, with different heights, were simultaneously treated by a new technique of ionic nitriding, entitled cathodic cage plasma nitriding (CCPN), in order to evaluate the efficiency of this technique to produce nitrided layers with better properties compared with those obtained using conventional ionic nitriding technique. This method is able to eliminate the edge effect in the samples, promoting a better uniformity of temperature, and...

  5. A novel mechanism of P-type ATPase autoinhibition involving both termini of the protein

    DEFF Research Database (Denmark)

    Ekberg, Kira; Palmgren, Michael; Veierskov, Bjarke;

    2010-01-01

    The activity of many P-type ATPases is found to be regulated by interacting proteins or autoinhibitory elements located in N- or C-terminal extensions. An extended C terminus of fungal and plant P-type plasma membrane H+-ATPases has long been recognized to be part of a regulatory apparatus...

  6. Demethoxycurcumin is a potent inhibitor of P-type ATPases from diverse kingdoms of life

    DEFF Research Database (Denmark)

    Dao, Trong Tuan; Sehgal, Pankaj; Thanh Tung, Truong;

    2016-01-01

    P-type ATPases catalyze the active transport of cations and phospholipids across biological membranes. Members of this large family are involved in a range of fundamental cellular processes. To date, a substantial number of P-type ATPase inhibitors have been characterized, some of which are used ...

  7. Nuclear microprobe imaging of gallium nitrate in cancer cells

    Science.gov (United States)

    Ortega, Richard; Suda, Asami; Devès, Guillaume

    2003-09-01

    Gallium nitrate is used in clinical oncology as treatment for hypercalcemia and for cancer that has spread to the bone. Its mechanism of antitumor action has not been fully elucidated yet. The knowledge of the intracellular distribution of anticancer drugs is of particular interest in oncology to better understand their cellular pharmacology. In addition, most metal-based anticancer compounds interact with endogenous trace elements in cells, altering their metabolism. The purpose of this experiment was to examine, by use of nuclear microprobe analysis, the cellular distribution of gallium and endogenous trace elements within cancer cells exposed to gallium nitrate. In a majority of cellular analyses, gallium was found homogeneously distributed in cells following the distribution of carbon. In a smaller number of cells, however, gallium appeared concentrated together with P, Ca and Fe within round structures of about 2-5 μm diameter located in the perinuclear region. These intracellular structures are typical of lysosomial material.

  8. Gallium-containing hydroxyapatite for potential use in orthopedics

    Energy Technology Data Exchange (ETDEWEB)

    Melnikov, P., E-mail: petrmelnikov@yahoo.com [Department of Clinical Surgery, Faculty of Medicine, Federal University of Mato Grosso do Sul, Campo Grande, Mato Grosso do Sul (Brazil); Teixeira, A.R.; Malzac, A. [Department of Clinical Surgery, Faculty of Medicine, Federal University of Mato Grosso do Sul, Campo Grande, Mato Grosso do Sul (Brazil); Coelho, M. de B. [Brazilian Agricultural Research Corporation - EMBRAPA (Brazil)

    2009-09-15

    A novel material that may be recommended for grafts and implants stimulating bone growth has been obtained by introducing gallium ions (up to 11.0 mass%) into crystalline lattice of hydroxyapatite. The doping was carried out using gallium nitrate and sodium gallate solutions. In both cases, lattice parameters of gallium-doped hydroxyapatite are identical to those of pure synthetic hydroxyapatite. Gallium does not replace calcium as a result of heterovalent substitution and consequently produces no distortions in the framework of hydroxyapatite matrix. It remains strongly fixed in the form of solid solution of intercalation. According to scanning electron microscopy images gallium insertion does not cause any morphological alterations in hydroxyapatite structure and the product developed meets physico-chemical criteria for biomaterial to be employed in orthopedic practice and local handling of traumatic injuries. Its future usage opens the opportunity to enhance osteosynthesis and calcium retention in loco.

  9. Luminance behavior of lithium-doped ZnO nanowires with p-type conduction characteristics.

    Science.gov (United States)

    Ko, Won Bae; Lee, Jun Seok; Lee, Sang Hyo; Cha, Seung Nam; Sohn, Jung Inn; Kim, Jong Min; Park, Young Jun; Kim, Hyun Jung; Hong, Jin Pyo

    2013-09-01

    The present study describes the room-temperature cathodeluminescence (CL) and temperature-dependent photoluminescence (PL) properties of p-type lithium (Li)-doped zinc oxide (ZnO) nanowires (NWs) grown by hydrothermal doping and post-annealing processes. A ZnO thin film was used as a seed layer in NW growth. The emission wavelengths and intensities of undoped ZnO NWs and p-type Li-doped ZnO NWs were analyzed for comparison. CL and PL observations of post-annealed p-type Li-doped ZnO NWs clearly exhibited a dominant sharp band-edge emission. Finally, a n-type ZnO thin film/p-type annealed Li-doped ZnO NW homojunction diode was prepared to confirm the p-type conduction of annealed Li-doped ZnO NWs as well as the structural properties measured by transmission electron microscopy.

  10. Application of neutron transmutation doping method to initially p-type silicon material.

    Science.gov (United States)

    Kim, Myong-Seop; Kang, Ki-Doo; Park, Sang-Jun

    2009-01-01

    The neutron transmutation doping (NTD) method was applied to the initially p-type silicon in order to extend the NTD applications at HANARO. The relationship between the irradiation neutron fluence and the final resistivity of the initially p-type silicon material was investigated. The proportional constant between the neutron fluence and the resistivity was determined to be 2.3473x10(19)nOmegacm(-1). The deviation of the final resistivity from the target for almost all the irradiation results of the initially p-type silicon ingots was at a range from -5% to 2%. In addition, the burn-up effect of the boron impurities, the residual (32)P activity and the effect of the compensation characteristics for the initially p-type silicon were studied. Conclusively, the practical methodology to perform the neutron transmutation doping of the initially p-type silicon ingot was established.

  11. Performance characterization of gallium nitride HEMT cascode switch for power conditioning applications

    Energy Technology Data Exchange (ETDEWEB)

    Chou, Po-Chien; Cheng, Stone, E-mail: stonecheng@mail.nctu.edu.tw

    2015-08-15

    Highlights: • We develop TO-257 cascoded GaN switch configuration in power conversion applications. • The normally-off cascode circuit provides 14.6 A/600 V characteristics. • Analysis of resistive and inductive switching performances shown in loaded circuits. • A 48-to-96 V boost converter is used to evaluate the benefit of GaN cascode switches. - Abstract: A hybrid cascoded GaN switch configuration is demonstrated in power conversion applications. A novel metal package is proposed for the packaging of a D-mode GaN MIS-HEMT cascoded with an integrated power MOSFET and a SBD. The normally-off cascode circuit provides a maximum drain current of 14.6 A and a blocking capability of 600 V. Analysis of 200 V/1 A power conversion characteristics are discussed and show the excellent switching performance in load circuits. Switching characteristics of the integral SiC SBD are also demonstrated. Finally, a 48-to-96 V boost converter is used to evaluate the benefit of GaN cascode switches. These results show that high-voltage GaN-HEMTs can be switching devices for an ultralow-loss converter circuit.

  12. Mode-selective phonon excitation in gallium nitride using mid-infrared free-electron laser

    Science.gov (United States)

    Kagaya, Muneyuki; Yoshida, Kyohei; Zen, Heishun; Hachiya, Kan; Sagawa, Takashi; Ohgaki, Hideaki

    2017-02-01

    The single-phonon mode was selectively excited in a solid-state sample. A mid-infrared free-electron laser, which was tuned to the target phonon mode, was irradiated onto a crystal cooled to a cryogenic temperature, where modes other than the intended excitation were suppressed. An A 1(LO) vibrational mode excitation on GaN(0001) face was demonstrated. Anti-Stokes Raman scattering was used to observe the excited vibrational mode, and the appearance and disappearance of the scattering band at the target wavenumber were confirmed to correspond to on and off switching of the pump free-electron laser and were fixed to the sample vibrational mode. The sum-frequency generation signals of the pump and probe lasers overlapped the Raman signals and followed the wavenumber shift of the pump laser.

  13. Investigating Enhancement Mode Gallium Nitride Power FETs in High Voltage, High Frequency Soft Switching Converters

    DEFF Research Database (Denmark)

    Nour, Yasser; Knott, Arnold; Jørgensen, Ivan Harald Holger

    2016-01-01

    An increased attention has been detected to develop smaller and lighter high voltage power converters in the range of 50V to 400V domain. The main applications for these converters are mainly focused for Power over Ethernet (PoE), LED lighting and AC adapters. This work will discuss a study...

  14. Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    Science.gov (United States)

    Choi, S. W.; Bachmann, K. J.; Lucovsky, G.

    1993-01-01

    Thin films of GaN have been deposited at relatively low growth temperatures by remote plasma-enhanced chemical-vapor deposition (RPECVD), using a plasma excited NH3, and trimethylgallium (TMG), injected downstream from the plasma. The activation energy for GaN growth has been tentatively assigned to the dissociation of NH groups as the primary N-atom precursors in the surface reaction with adsorbed TMG, or TMG fragments. At high He flow rates, an abrupt increase in the growth rate is observed and corresponds to a change in the reaction mechanism attributed to the formation of atomic N. XRD reveals an increased tendency to ordered growth in the (0001) direction with increasing growth temperature, He flow rate, and RF plasma power. IR spectra show the fundamental lattice mode of GaN at 530 cm without evidence for vibrational modes of hydrocarbon groups.

  15. Surface passivation of gallium nitride by ultrathin RF-magnetron sputtered Al2O3 gate.

    Science.gov (United States)

    Quah, Hock Jin; Cheong, Kuan Yew

    2013-08-14

    An ultrathin RF-magnetron sputtered Al2O3 gate on GaN subjected to postdeposition annealing at 800 °C in O2 ambient was systematically investigated. A cross-sectional energy-filtered transmission electron microscopy revealed formation of crystalline Al2O3 gate, which was supported by X-ray diffraction analysis. Various current conduction mechanisms contributing to leakage current of the investigated sample were discussed and correlated with metal-oxide-semiconductor characteristics of this sample.

  16. Characterization of Cross-Sectioned Gallium Nitride High-Electron-Mobility Transistors with In Situ Biasing

    Science.gov (United States)

    Hilton, A. M.; Brown, J. L.; Moore, E. A.; Hoelscher, J. A.; Heller, E. R.; Dorsey, D. L.

    2015-10-01

    AlGaN/GaN high-electron-mobility transistors (HEMTs) were characterized in cross-section by Kelvin probe force microscopy (KPFM) during in situ biasing. The HEMTs used in this study were specially designed to maintain full and representative transistor functionality after cross-sectioning perpendicular to the gate width dimension to expose the active channel from source to drain. A cross-sectioning procedure was established that produces samples with high-quality surfaces and minimal degradation in initial transistor performance. A detailed description of the cross-sectioning procedure is provided. Samples were characterized by KPFM, effectively mapping the surface potential of the device in two-dimensional cross-section, including under metallization layers (i.e., gate, field plates, and ohmic contacts). Under the gate and field plate layers are where electric field, temperature, and temperature gradients are all most commonly predicted to have peak values, and where degradation and failure are most likely, and so this is where direct measurements are most critical. In this work, the surface potential of the operating device was mapped in cross-section by KPFM. Charge redistribution was observed during and after biasing, and the surface potential was seen to decay with time back to the prebias condition. This work is a first step toward directly mapping and localizing the steady-state and transient charge distribution due to point defects (traps) before, during, and after device operation, including normally inaccessible regions such as under metallization layers. Such measurements have not previously been demonstrated for GaN HEMT technology.

  17. Modeling and Simulation of a Gallium Nitride (GaN) Betavoltaic Energy Converter

    Science.gov (United States)

    2016-06-01

    technologies, nuclear materials detection, accelerator shielding, and dose/energy deposition in materials for medical therapies . An electron beam with...semiconductor devices have the potential to improve the efficiency of direct energy conversion and indirect energy conversion isotope batteries, making...offering higher- energy-conversion efficiency than 2-dimensional geometries. 15. SUBJECT TERMS GaN, betavoltaic, device simulation, isotope power source

  18. Gallium Nitride Monolithic Microwave Integrated Circuit Designs Using 0.25-micro m Qorvo Process

    Science.gov (United States)

    2017-07-27

    250-µm-wide mesa resistor was used for the 100- ohm isolation resistor. Since GaN-on-SiC is an excellent thermal conductor, the isolation resistor...characteristic impedance of 70.7 ohm and an electrical length of 90° at the design frequency plus a 100- ohm isolation resistor between the 2 equal power split

  19. Broadband 0.25-um Gallium Nitride (GaN) Power Amplifier Designs

    Science.gov (United States)

    2017-08-14

    Ohm PORT P=1 Z=50 Ohm RP=87.5ohm/mm...CP=-0.31pF/mm For 1.75mm, RP=50ohms, CP=0.54pf CP = 0.31 * size size=1.75 RP = 87.5 / size CAP ID=C1 C=CP1 pF RES ID=R1 R=RP Ohm IND ID=L1 L=LP1 nH CAP...ID=C2 C=Cser2 pF IND ID=L2 L=Lser2 nH IND ID=L3 L=LP1 nH CAP ID=C3 C=CP1 pF PORT P=1 Z=50 Ohm PORT P=2 Z=50 Ohm size=1.75 RP = 87.5 / size CP =

  20. Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    Science.gov (United States)

    Choi, S. W.; Bachmann, K. J.; Lucovsky, G.

    1993-01-01

    Thin films of GaN have been deposited at relatively low growth temperatures by remote plasma-enhanced chemical-vapor deposition (RPECVD), using a plasma excited NH3, and trimethylgallium (TMG), injected downstream from the plasma. The activation energy for GaN growth has been tentatively assigned to the dissociation of NH groups as the primary N-atom precursors in the surface reaction with adsorbed TMG, or TMG fragments. At high He flow rates, an abrupt increase in the growth rate is observed and corresponds to a change in the reaction mechanism attributed to the formation of atomic N. XRD reveals an increased tendency to ordered growth in the (0001) direction with increasing growth temperature, He flow rate, and RF plasma power. IR spectra show the fundamental lattice mode of GaN at 530 cm without evidence for vibrational modes of hydrocarbon groups.

  1. Optical and micro-structural characterizations of MBE grown indium gallium nitride polar quantum dots

    KAUST Repository

    Elafandy, Rami T.

    2011-12-01

    Comparison between indium rich (27%) InGaN/GaN quantum dots (QDs) and their underlying wetting layer (WL) is performed by means of optical and structural characterizations. With increasing temperature, micro-photoluminescence (μPL) study reveals the superior ability of QDs to prevent carrier thermalization to nearby traps compared to the two dimensional WL. Thus, explaining the higher internal quantum efficiency of the QD nanostructure compared to the higher dimensional WL. Structural characterization (X-ray diffraction (XRD)) and transmission electron microscopy (TEM)) reveal an increase in the QD indium content over the WL indium content which is due to strain induced drifts. © 2011 IEEE.

  2. Electrical characterization of dislocations in gallium nitride using advanced scanning probe techniques

    Science.gov (United States)

    Simpkins, Blake Shelley Ginsberg

    GaN-based materials are promising for high speed and power applications such as amplifier and communications circuits. Ga, In, and AIN-based alloys span a wide optical range (2--6.1 eV) and exhibit strong polarizations making them useful in many devices; however, films are highly defective (˜10 8 dislocations cm-2) due to lack of suitable substrates. Thus, nanoscale electronic characterization of these dislocations is critical for device and growth optimization. Scanning probe techniques enable characterization at length-scales unattainable by conventional techniques. First, scanning Kelvin probe microscopy (SKPM) was used to image surface potential variations due to charged dislocations in HVPE-grown GaN. The film's structural evolution "with thickness was monitored showing a decrease in dislocation density, likely through dislocation reaction. Numerical simulations were used to investigate tip-size effects when imaging highly localized (tens of nm) potential variations indicating that measured dislocation induced potential features in GaN can be much smaller (˜80%) than true variations. Next, capacitance variations in MBE-grown HFETs, due to dislocations-induced carrier depletion, were imaged with scanning capacitance microscopy (SCM). The distribution of these charged centers was correlated with buffer schemes showing that an AIN buffer leads to pseudomorphic (2D) nucleation and randomly distributed misfit dislocations while deposition directly on SiC results in island (3D) nucleation and a domain structure with dislocations grouped at domain boundaries. Hall measurements and numerical simulations were also carried out to further study the implications of these microstructures. Numerical results indicated that randomly distributed dislocations deplete a larger fraction of free carriers than the same density of grouped dislocations and correlated favorably with Hall results. Correlated SKPM and conductive AFM (C-AFM) measurements were then used to study negatively charged and highly conductive dislocations in MBE-grown GaN and established that edge component dislocations are negatively charged while pure screw dislocations are uncharged and highly conductive. Finally, C-AFM and surface photovoltage (SPV) microscopy were used to evaluate local electronic behavior of MOCVD-grown Mg-doped GaN showing regions of reduced conductivity and increased SPV correlated with dislocations. Mg segregation to dislocation cores, leaving Mg-poor regions surrounding the dislocations, was sited as the cause for the observed local electronic properties.

  3. Trap Characterization in High Field, High Temperature Stressed Gallium Nitride High Electron Mobility Transistors

    Science.gov (United States)

    2013-03-01

    based SSPAs offer equal power-added efficiency ( PAE ) but at four to five times greater power density [4]. The Department of Defense (DoD) wishes to...previously with stable devices. Lifetime for the parts developed was increased by a factor of 105 [6]. A PAE of 62% was achieved for frequencies

  4. Cubic Gallium Nitride on Micropatterned Si (001) for Longer Wavelength LEDs

    Energy Technology Data Exchange (ETDEWEB)

    Durniak, Mark T. [Rensselaer Polytechnic Inst., Troy, NY (United States). Dept. of Materials Science and Engineering; Chaudhuri, Anabil [Univ. of New Mexico, Albuquerque, NM (United States). Center for High Technology Materials; Smith, Michael L. [Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Advanced Material Sciences; Allerman, Andrew A. [Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Advanced Material Sciences; Lee, S. C. [Univ. of New Mexico, Albuquerque, NM (United States). Center for High Technology Materials; Brueck, S. R. J. [Univ. of New Mexico, Albuquerque, NM (United States). Center for High Technology Materials; Wetzel, Christian [Rensselaer Polytechnic Inst., Troy, NY (United States). Dept. of Physics, Applied Physics, and Astronomy and Dept. of Materials Science and Engineering

    2016-03-01

    GaInN/GaN heterostructures of cubic phase have the potential to overcome the limitations of wurtzite structures commonly used for light emitting and laser diodes. Wurtzite GaInN suffers from large internal polarization fields, which force design compromises ( 0001 ) towards ultra-narrow quantum wells and reduce recombination volume and efficiency. Cubic GaInN microstripes grown at Rensselaer Polytechnic Institute by metal organic vapor phase epitaxy on micropatterned Si , with {111} v-grooves oriented along Si ( 001 ) , offer a system free of internal polarization fields, wider quantum wells, and smaller <00$\\bar1$> bandgap energy. We prepared 6 and 9 nm Ga x In 1-x N/GaN single quantum well structures with peak wavelength ranges from 520 to 570 nm with photons predominately polarized perpendicular to the grooves. We estimate a cubic InN composition range of 0 < x < 0.5 and an upper limit of the internal quantum efficiency of 50%. Stripe geometry and polarization may be suitable for mode confinement and reduced threshold stimulated emission.

  5. Investigation of Gallium Nitride Transistor Reliability through Accelerated Life Testing and Modeling

    Science.gov (United States)

    2011-12-01

    appreciated my associations with classmates and friends: Ben Crossley, Derrick Langley, Will Cobb, Neal Kraft , Scott Callihan, Dane Fuller, Kurt... saturation region, when VD ≥ (VG – VT), the drain current is 2( ) ( ) 2 ( )D G T W xI V V L d d      . (8) Typical drain current versus...The unity current gain cut-off frequency is sat T gs g gd vf L L L    (11) where vsat is the saturation velocity of the narrow bandgap

  6. Carrier emission of n-type gallium nitride illuminated by femtosecond laser pulses

    Science.gov (United States)

    Li, Runze; Zhu, Pengfei; Chen, Jie; Cao, Jianming; Rentzepis, Peter M.; Zhang, Jie

    2016-12-01

    The carrier emission efficiency of light emitting diodes is of fundamental importance for many technological applications, including the performance of GaN and other semiconductor photocathodes. We have measured the evolution of the emitted carriers and the associated transient electric field after femtosecond laser excitation of n-type GaN single crystals. These processes were studied using sub-picosecond, ultrashort, electron pulses and explained by means of a "three-layer" analytical model. We find that for pump laser intensities on the order of 1011 W/cm2, the electrons that escaped from the crystal surface have a charge of ˜2.7 pC and a velocity of ˜1.8 μm/ps. The associated transient electrical field evolves at intervals ranging from picoseconds to nanoseconds. These results provide a dynamic perspective on the photoemission properties of semiconductor photocathodes.

  7. Outphasing control of gallium nitride based very high frequency resonant converters

    DEFF Research Database (Denmark)

    Madsen, Mickey Pierre; Knott, Arnold; Andersen, Michael A. E.

    2015-01-01

    . Then the modulation technique is described and the design equations given. Finally a design example is given for a converter consisting of two class E inverters with a lossless combiner and a common half bridge rectifier. It is shown how outphasing modulation can be used for line regulation while insuring equal...

  8. Outphasing Control of Gallium Nitride based Very High Frequency Resonant Converter

    DEFF Research Database (Denmark)

    Madsen, Mickey Pierre; Perreault, David J.; Knott, Arnold

    2015-01-01

    . Then the modulation technique is described and the design equations given. Finally a design example is given for a converter consisting of two class E inverters with a lossless combiner and a common half bridge rectifier. It is shown how outphasing modulation can be used for line regulation while insuring equal...

  9. Study on Wide-gap Gallium-nitride Based Films and Their Quantum-dots Devices

    Science.gov (United States)

    2006-09-05

    propose that the size controlled GaN based quantum dot LED for the prospective white light source cold be used to simulate the sun light for higher Lumen...compositions, the quantum dots of InGaN or InN could emit light to cover the whole visible spectrum. The quantum dot based white light device could...wavelength could be shifted from red to the blue region. The high efficiency, quantum dot size-controlled, white light LED could thus be produced

  10. Proton Irradiation-Induced Metal Voids in Gallium Nitride High Electron Mobility Transistors

    Science.gov (United States)

    2015-09-01

    shaped undercut, which leaves the sample attached by a small tab, in order to extract the lamella for TEM analysis as seen in Figure 22. Figure 21...Pt welded to Omni Probe for lift out. 33 The Omni Probe needle device is attached to a gun, which inserts the probe near the working platform...microscopy for neuronal circuit reconstruction.” Current Opinion in Neurobiology , vol. 22, no. 1, pp. 154–161, Feb. 2012. [33] R. J. Ross, “45. Transmission

  11. Covalent attachment of a peptide to the surface of gallium nitride

    Science.gov (United States)

    Makowski, Matthew S.; Zemlyanov, Dmitry Y.; Lindsey, Jason A.; Bernhard, Jonathan C.; Hagen, Evan M.; Chan, Burke K.; Petersohn, Adam A.; Medow, Matthew R.; Wendel, Lindsay E.; Chen, Dafang; Canter, Jamie M.; Ivanisevic, Albena

    2011-08-01

    The properties of GaN have made it not only an ideal material for high power and high frequency electronic devices, but also a semiconductor suitable for application in biosensing devices. The utilization of GaN in electronic biosensors has increased the importance of characterizing robust and easily implemented organic functionalization methods for GaN surfaces. This work demonstrates and characterizes a route to functionalize the GaN (0001) surface with two organic molecules, hexylamine and a peptide, through olefin cross-metathesis with Grubbs first generation catalyst. The GaN (0001) surface was chlorinated, functionalized with a terminal alkene group using a Grignard reaction, and then terminated with a carboxyl group using an olefin cross-metathesis reaction. With a condensation reaction, the final step in the reaction scheme bound hexylamine or a peptide to the carboxyl terminated GaN surface. Qualitative and quantitative X-ray photoelectron spectroscopy (XPS) data verified the success of each step in the reaction scheme. Surface element composition, adlayer coverages, and adlayer thicknesses were calculated based on the XPS data. At least a monolayer of surface molecules covered the GaN surface.

  12. Near Field Imaging of Charge Transport in Gallium Nitride and Zinc Oxide Nanostructures

    Science.gov (United States)

    2010-12-01

    Aluminum (Al) sources [37]. A radio frequency (RF) plasma nitrogen, N2, source was also used [37]. First, a thin 30 to 120 nm buffer layer of aluminum...Deposition,” Advanced Materias , vol. 22, no. 14, pp. 1607–1612, Apr. 2010. [17] G. Rieke, “Photodiodes and Other Junction-Based Detectors,” in Detection

  13. Investigating Enhancement Mode Gallium Nitride Power FETs in High Voltage, High Frequency Soft Switching Converters

    DEFF Research Database (Denmark)

    Nour, Yasser; Knott, Arnold; Jørgensen, Ivan Harald Holger

    2016-01-01

    An increased attention has been detected to develop smaller and lighter high voltage power converters in the range of 50V to 400V domain. The main applications for these converters are mainly focused for Power over Ethernet (PoE), LED lighting and AC adapters. This work will discuss a study of us...

  14. The Effects of Rare Earth Doping on Gallium Nitride Thin Films

    Science.gov (United States)

    2011-09-01

    capture in a solid state device,” Journal of Physics D: Applied Physics, vol. 43, p. 075502, 2010. [28] D. S. McGregor, M. F. Ohmes , R. E. Ortiz, A. S...1044, 1964. [5] M. Cardona and L. Ley , Photoemission in Solids: General Principles. Springer- Verlag New York, 1978. [6] C. Cohen-Tannoudji, B. Diu...A, vol. 50, no. 6, pp. 449–450, 1975. [46] L. Ley , R. A. Pollak, F. R. McFeely, S. P. Kowalczyk, and D. A. Shirley, “Total valence-band densities of

  15. Fe-doping in hydride vapor-phase epitaxy for semi-insulating gallium nitride

    Science.gov (United States)

    Richter, E.; Gridneva, E.; Weyers, M.; Tränkle, G.

    2016-12-01

    Fe-doping of GaN layers of 3 in. in diameter and a thickness of 1 mm in a vertical AIX-HVPE reactor is studied. Ferrocen was used as Fe source. It is shown that a sufficient uniformity of growth conditions, a high purity of undoped GaN layers, and a moderate Fe incorporation of 2×1018 cm-3 allow for growth of semi-insulating GaN layers with a sufficiently high specific resistivity even at elevated temperature. This makes the material suitable as substrate for electronic power devices at high power or in harsh ambient.

  16. Heterogeneous integration of gallium nitride light-emitting diodes on diamond and silica by transfer printing.

    Science.gov (United States)

    Trindade, A J; Guilhabert, B; Xie, E Y; Ferreira, R; McKendry, J J D; Zhu, D; Laurand, N; Gu, E; Wallis, D J; Watson, I M; Humphreys, C J; Dawson, M D

    2015-04-06

    We report the transfer printing of blue-emitting micron-scale light-emitting diodes (micro-LEDs) onto fused silica and diamond substrates without the use of intermediary adhesion layers. A consistent Van der Waals bond was achieved via liquid capillary action, despite curvature of the LED membranes following release from their native silicon growth substrates. The excellence of diamond as a heat-spreader allowed the printed membrane LEDs to achieve optical power output density of 10 W/cm(2) when operated at a current density of 254 A/cm(2). This high-current-density operation enabled optical data transmission from the LEDs at 400 Mbit/s.

  17. Excellent Performance of Gallium Nitride%性能优异的氮化镓

    Institute of Scientific and Technical Information of China (English)

    蒂姆·雷德福; 李兵

    2007-01-01

    英国剑桥大学的科林·汉弗莱斯拥有21世纪的“魔法石”。他和世界各地的一批科学家都在研究炼金术上梦寐以求的东西:这种物质可以把普通金属变成金子,或者说金钱;它可以传送光线而不会将能量以热的形式浪费掉;它可以把手机信号扩大10倍,让电脑的速度提高1万倍。

  18. First-principles calculations of structure and high pressure phase transition in gallium nitride

    Institute of Scientific and Technical Information of China (English)

    Tan Li-Na; Hu Cui-E; Yu Bai-Ru; Chen Xiang-Rong

    2007-01-01

    The phase transitions of semiconductor GaN from the Wurtzite (WZ) structure and the zinc-blende (ZB) structure to the rocksalt (RS) structure are investigated by using the first-principles plane-wave pseudopotential density functional method combined with the ultrasoft pseudopotential scheme in the generalized gradient approximation (GGA)correction. It is found that the phase transitions from the WZ structure and the ZB structure to the RS structure occur at pressures of 46.1 GPa and 45.2 GPa, respectively. The lattice parameters, bulk moduli and their pressure derivatives of these structures of GaN are also calculated. Our results are consistent with available experimental and other theoretical results. The dependence of the normalized formula-unit volume V/Vo on pressure P is also successfully obtained.

  19. Parallel Aligned Mesopore Arrays in Pyramidal-Shaped Gallium Nitride and Their Photocatalytic Applications.

    Science.gov (United States)

    Kim, Hee Jun; Park, Joonmo; Ye, Byeong Uk; Yoo, Chul Jong; Lee, Jong-Lam; Ryu, Sang-Wan; Lee, Heon; Choi, Kyoung Jin; Baik, Jeong Min

    2016-07-20

    Parallel aligned mesopore arrays in pyramidal-shaped GaN are fabricated by using an electrochemical anodic etching technique, followed by inductively coupled plasma etching assisted by SiO2 nanosphere lithography, and used as a promising photoelectrode for solar water oxidation. The parallel alignment of the pores of several tens of micrometers scale in length is achieved by the low applied voltage and prepattern guided anodization. The dry etching of single-layer SiO2 nanosphere-coated GaN produces a pyramidal shape of the GaN, making the pores open at both sides and shortening the escape path of evolved gas bubbles produced inside pores during the water oxidation. The absorption spectra show that the light absorption in the UV range is ∼93% and that there is a red shift in the absorption edge by 30 nm, compared with the flat GaN. It also shows a remarkable enhancement in the photocurrent density by 5.3 times, compared with flat GaN. Further enhancement (∼40%) by the deposition of Ni was observed due to the generation of an electric field, which increases the charge separation ratio.

  20. Development and evaluation of gallium nitride-based thin films for x-ray dosimetry.

    Science.gov (United States)

    Hofstetter, Markus; Howgate, John; Sharp, Ian D; Stutzmann, Martin; Thalhammer, Stefan

    2011-06-07

    X-ray radiation plays an important role in medical procedures ranging from diagnostics to therapeutics. Due to the harm such ionizing radiation can cause, it has become common practice to closely monitor the dosages received by patients. To this end, precise online dosimeters have been developed with the dual objectives of monitoring radiation in the region of interest and improving therapeutic methods. In this work, we evaluate GaN thin film high electron mobility heterostructures with sub-mm(2) detection areas as x-ray radiation detectors. Devices were tested using 40-300 kV Bremsstrahlung x-ray sources. We find that the photoconductive device response exhibits a large gain, is almost independent of the angle of irradiation, and is constant to within 2% of the signal throughout this medical diagnostic x-ray range, indicating that these sensors do not require recalibration for geometry or energy. Furthermore, the devices show a high sensitivity to x-ray intensity and can measure in the air kerma rate (free-in-air) range of 1 µGy s(-1) to 10 mGy s(-1) with a signal stability of ±1% and a linear total dose response over time. Medical conditions were simulated by measurements of device responses to irradiation through human torso phantoms. Direct x-ray imaging is demonstrated using the index finger and wrist sections of a human phantom. The results presented here indicate that GaN-based thin film devices exhibit a wide range of properties, which make them promising candidates for dosimetry applications. In addition, with potential detection volumes smaller than 10(-6) cm(3), they are well suited for high-resolution x-ray imaging. Moreover, with additional engineering steps, these devices can be adapted to potentially provide both in vivo biosensing and x-ray dosimetry.

  1. Elastic scattering by hot electrons and apparent lifetime of longitudinal optical phonons in gallium nitride

    Energy Technology Data Exchange (ETDEWEB)

    Khurgin, Jacob B., E-mail: jakek@jhu.edu [Department of Electrical and Computer Engineering, Johns Hopkins University, Baltimore, Maryland 21218 (United States); Bajaj, Sanyam; Rajan, Siddharth [Department of Electrical and Computer Engineering, The Ohio State University, Columbus, Ohio 43210 (United States)

    2015-12-28

    Longitudinal optical (LO) phonons in GaN generated in the channel of high electron mobility transistors (HEMT) are shown to undergo nearly elastic scattering via collisions with hot electrons. The net result of these collisions is the diffusion of LO phonons in the Brillouin zone causing reduction of phonon and electron temperatures. This previously unexplored diffusion mechanism explicates how an increase in electron density causes reduction of the apparent lifetime of LO phonons, obtained from the time resolved Raman studies and microwave noise measurements, while the actual decay rate of the LO phonons remains unaffected by the carrier density. Therefore, the saturation velocity in GaN HEMT steadily declines with increased carrier density, in a qualitative agreement with experimental results.

  2. Fabrication and optical property of silicon oxide layer coated semiconductor gallium nitride nanowires.

    Science.gov (United States)

    Zhang, Jun; Zhang, Lide; Jiang, Feihong; Yang, Yongdong; Li, Jianping

    2005-01-13

    Quasi one-dimensional GaN-SiO(2) nanostructures, with a silicon oxide layer coated on semiconductor GaN nanowires, were successfully synthesized through as-synthesized SiO(2) nanoparticles-assisted reaction. The experimental results indicate that the nanostructure consists of single-crystalline wurtzite GaN nanowire core, an amorphous SiO(2) outer shell separated in the radial direction. These quasi one-dimensional nanowires have the diameters of a few tens of nanometers and lengths up to several hundreds of micrometers. The photoluminescence spectrum of the GaN-SiO(2) nanostructures consists of one broad blue-light emission peak at 480 nm and another weak UV emission peak at 345 nm. The novel method, which may results in high yield and high reproducibility, is demonstrated to be a unique technique for producing nanostructures with controlled morphology.

  3. Thermal non-oxidative aromatization of light alkanes catalyzed by gallium nitride.

    Science.gov (United States)

    Li, Lu; Mu, Xiaoyue; Liu, Wenbo; Kong, Xianghua; Fan, Shizhao; Mi, Zetian; Li, Chao-Jun

    2014-12-15

    The thermal catalytic activity of GaN in non-oxidative alkane dehydroaromatization has been discovered for the first time. The origin of the catalytic activity was studied experimentally and theoretically. Commercially available GaN powders with a wurtzite crystal structure showed superior stability and reactivity for converting light alkanes, including methane, propane, n-butane, n-hexane and cyclohexane into benzene at an elevated temperature with high selectivity. The catalyst is highly robust and can be used repeatedly without noticeable deactivation.

  4. A full free spectral range tuning of p-i-n doped Gallium Nitride microdisk cavity

    CERN Document Server

    Niu, Nan; Aharonovich, Igor; Russell, Kasey J; Woolf, Alexander; Sadler, Thomas C; El-Ella, Haitham A R; Kappers, Menno J; Oliver, Rachel A; Hu, Evelyn L

    2012-01-01

    Effective, permanent tuning of the whispering gallery modes (WGMs) of p-i-n doped GaN microdisk cavity with embedded InGaN quantum dots over one free spectral range is successfully demonstrated by irradiating the microdisks with a ultraviolet laser (380nm) in DI water. For incident laser powers between 150 and 960 nW, the tuning rate varies linearly. Etching of the top surface of the cavity is proposed as the driving force for the observed shift in WGMs, and is supported by experiments. The tuning for GaN/InGaN microdisk cavities is an important step for deterministically realizing novel nanophotonic devices for studying cavity quantum electrodynamics.

  5. Chemical etching behaviors of semipolar (11̄22) and nonpolar (11̄20) gallium nitride films.

    Science.gov (United States)

    Jung, Younghun; Baik, Kwang Hyeon; Mastro, Michael A; Hite, Jennifer K; Eddy, Charles R; Kim, Jihyun

    2014-08-14

    Wet chemical etching using hot KOH and H3PO4 solutions was performed on semipolar (11̄22) and nonpolar (11̄20) GaN films grown on sapphire substrates. An alternating KOH/H3PO4/KOH etch process was developed to control the orientation of the facets on the thin-film surface. The initial etch step in KOH produced c- and m-plane facets on the surface of both semipolar (11̄22) and nonpolar (11̄20) GaN thin-films. A second etch step in H3PO4 solution additionally exposed a (̄1̄12̄2) plane, which is chemically stable in H3PO4 solution. By repeating the chemical etch with KOH solution, the m-plane facets as seen in the original KOH etch step were recovered. The etching methods developed in our work can be used to control the surface morphologies of nonpolar and semipolar GaN-based optoelectronic devices such as light-emitting diodes and solar cells.

  6. Dislocation Reduction Mechanisms in Gallium Nitride Films Grown by Canti-Bridge Epitaxy Method

    Institute of Scientific and Technical Information of China (English)

    XING Zhi-Gang; WANG Jing; PEI Xiao-Jiang; WAN Wei; CHEN Hong; ZHOU Jun-Ming

    2007-01-01

    @@ By using the special maskless V-grooved c-plane sapphire as the substrate, we previously developed a novel GaN LEO method, or the so-called canti-bridge epitaxy (CBE), and consequently wing-tilt-free GaN films were obtained with low dislocation densities, with which all the conventional difficulties can be overcome [J. Vacuum Sci.Technol. B 23 (2005) 2476]. Here the evolution manner of dislocations in the CBE GaN films is investigated using transmission electron microscopy. The mechanisms of dislocation reduction are discussed. Dislocation behaviour is found to be similar to that in the conventional LEO GaN films except the enhanced dislocation-combination at the coalescence boundary that is a major dislocation-reduction mechanism for the bent horizontal-propagating dislocations in the CBE GaN films. The enhancement of this dislocation-combination probability is believed to result from the inclined shape and the undulate morphology of the sidewalls, which can be readily obtained in a wide range of applicable film-growth conditions during the GaN CBE process. Further development of the GaN CBE method and better crystal-quality of the GaN film both are expected.

  7. Let there be light--with gallium nitride: the 2014 Nobel Prize in Physics.

    Science.gov (United States)

    Von Dollen, Paul; Pimputkar, Siddha; Speck, James S

    2014-12-15

    Significant gains in energy savings now underway can be traced to a single invention--the blue light-emitting diode. GaN-based blue LED technology not only resulted in efficient white light sources, but continues to enable a host of applications and scientific inquiries. The researchers primarily responsible for the development of the blue LED were awarded the 2014 Nobel Prize in Physics.

  8. Radical formation at the gallium nitride nanowire-electrolyte interface by photoactivated charge transfer.

    Science.gov (United States)

    Philipps, J M; Müntze, G M; Hille, P; Wallys, J; Schörmann, J; Teubert, J; Hofmann, D M; Eickhoff, M

    2013-08-16

    We investigated the transfer of photogenerated charge carriers from GaN nanowires into a surrounding electrolyte by electron paramagnetic resonance (EPR) and fluorescence spectroscopy. Using 5,5-dimethyl-1-pyrroline-N-oxide (DMPO) as a spin trap we find that the formation of hydroxyl radicals dominates in acidic, neutral and moderately basic environments, while in an electrolyte with a pH of 13.5 the superoxide formation becomes detectable. We explain the two processes considering the redox potentials for radical formation in the electrolyte as well as the positions of the conduction and valence bands. The role of surface band bending and surface states in the semiconductor is discussed.

  9. Direct observation of depth-dependent atomic displacements associated with dislocations in gallium nitride.

    Science.gov (United States)

    Lozano, J G; Yang, H; Guerrero-Lebrero, M P; D'Alfonso, A J; Yasuhara, A; Okunishi, E; Zhang, S; Humphreys, C J; Allen, L J; Galindo, P L; Hirsch, P B; Nellist, P D

    2014-09-26

    We demonstrate that the aberration-corrected scanning transmission electron microscope has a sufficiently small depth of field to observe depth-dependent atomic displacements in a crystal. The depth-dependent displacements associated with the Eshelby twist of dislocations in GaN normal to the foil with a screw component of the Burgers vector are directly imaged. We show that these displacements are observed as a rotation of the lattice between images taken in a focal series. From the sense of the rotation, the sign of the screw component can be determined.

  10. Temperature Dependence of 1/f Noise in Gallium Nitride Epitaxial Layer

    Directory of Open Access Journals (Sweden)

    Ashutosh Kumar

    2011-01-01

    Full Text Available 1/f noise investigation was performed on n-GaN epitaxial layer grown on sapphire. The variation of spectral power density of voltage fluctuations density was observed as a function of frequency (100-50 Hz and it showed the 1/f spectra. This type of behavior was attributed to the presence of traps. The variation in spectral power density of voltage fluctuations with temperature was also observed with in the temperature range 80 K and 300 K and it was found to be slightly increasing with temperature. It was attributed to the trapping-detrapping process of charge carriers by the defects. Four probe configuration was used for noise measurement and contacts were made with indium. To check the stability and ohmic behavior of contacts, I-V measurements were performed with in the temperature range 80-325 K.

  11. Dynamic visualization of axial p-n junctions in single gallium nitride nanorods under electrical bias.

    Science.gov (United States)

    Lu, Yu-Jung; Lu, Ming-Yen; Yang, Yu-Chen; Chen, Hung-Ying; Chen, Lih-Juann; Gwo, Shangjr

    2013-09-24

    We demonstrate a direct visualization method based on secondary electron (SE) imaging in scanning electron microscopy for mapping electrostatic potentials across axial semiconductor nanorod p-n junctions. It is found that the SE doping contrast can be directly related to the spatial distribution of electrostatic potential across the axial nanorod p-n junction. In contrast to the conventional SE doping contrast achieved for planar p-n junctions, the quasi-one-dimensional geometry of nanorods allows for high-resolution, versatile SE imaging under high accelerating voltage, long working distance conditions. Furthermore, we are able to delineate the electric field profiles across the axial nanorod p-n junction as well as depletion widths at different reverse biases. By using standard p-n junction theory and secondary ion mass spectroscopy, the carrier concentrations of p- and n-regions can be further extracted from the depletion widths under reverse biasing conditions. This direct imaging method enables determination of electrostatic potential variation of p-n junctions in semiconductor nanorod and nanowire devices with a spatial resolution better than 10 nm.

  12. Directed growth of horizontally aligned gallium nitride nanowires for nanoelectromechanical resonator arrays.

    Science.gov (United States)

    Henry, Tania; Kim, Kyungkon; Ren, Zaiyuan; Yerino, Christopher; Han, Jung; Tang, Hong X

    2007-11-01

    We report the growth of horizontally aligned arrays and networks of GaN nanowires (NWs) as resonant components in nanoelectromechanical systems (NEMS). A combination of top-down selective area growth (SAG) and bottom-up vapor-liquid-solid (VLS) synthesis enables flexible fabrication of highly ordered nanowire arrays in situ with no postgrowth dispersion. Mechanical resonance of free-standing nanowires are measured, with quality factors (Q) ranging from 400 to 1000. We obtained a Young's modulus (E) of approximately 338 GPa from an array of NWs with varying diameters and lengths. The measurement allows detection of nanowire motion with a rotating frame and reveals dual fundamental resonant modes in two orthogonal planes. A universal ratio between the resonant frequencies of these two fundamental modes, irrespective of their dimensions, is observed and attributed to an isosceles cross section of GaN NWs.

  13. Radiation-Hardened Gallium Nitride Detector and Arrays for Fusion Diagnostics

    Energy Technology Data Exchange (ETDEWEB)

    Sun, K. X., and MacNeil, L.

    2011-09-08

    This poster reports testing to confirm that GaN devices exhibit the extreme radiation hardness needed for use at the NIF, functioning properly after 1x10{sup 12} protons/cm{sup 2} proton irradiation in one year.

  14. Efficiency droop in indium gallium nitride light emitters: An introduction to photon quenching processes

    Science.gov (United States)

    Sarkissian, Raymond

    This thesis contains work from two separate projects, a study of the efficiency of light emitting diodes, and a tapered-fiber approach to photonic crystal integrated photonics. The first part of this thesis describes an experimental investigation of the quantum efficiency of InGaN-based light emitters. Blue and Green LEDs that utilize InGaN quantum wells for their active medium suffer from a reduction in efficiency with increasing bias. This phenomenon is called efficiency droop. In this thesis experimental evidence for significant quenching of photon population in InGaN is presented and its relevance to the efficiency droop problem in InGaN-based light emitting structures is discussed. An equilibrium rate equation model is set up to demonstrate that radiative efficiency for this loss mechanism not only has a similar dependence on carrier density as Auger recombination process, but it also possesses the right order of magnitude making it difficult to distinguish between the two and possibly leading to errors in interpretation. The impact of photon quenching processes on device performance is emphasized by demonstrating loss of efficiency for spectral regions where there is experimental evidence for photon quenching. We have observed this phenomenon for both c-plane and m-plane light emitting structures. Both structures exhibit droop-like behavior for spectral regions where there is evidence for photon quenching. We have also observed and characterized the dynamical Stark effect for an m-plane light emitter considered in this manuscript. Our results revealed localization centers with a corresponding band-edge energy of 388nm and an excitonic binding energy of 17.81mev. Furthermore, fabrication of a photonic crystal waveguide fiber taper coupler is demonstrated with a peak coupling efficiency of 97 %. All four ports of the device are accessible providing an opportunity for investigation of simultaneous interaction of different light sources inside the photonic crystal cavity. A numerical model is set forth to analyze such devices with an excellent agreement with the experimental data. One important result of that theory is the ability to experimentally extract the phase contribution of optical resonators that employ periodic structures such as photonic crystal cavities. This device has also been used to demonstrate all-optical nonlinear shift and bleaching of cavity resonances via non-degenerate two photon absorption, non-degenerate Kerr mechanism, free carrier absorption, and free carrier plasma effects. As the response time of two photon processes are very fast, about 10 fs, this device can be used in ultrafast low energy all optical switching applications.

  15. Photoluminescence Study of Gallium Nitride Thin Films Obtained by Infrared Close Space Vapor Transport

    Directory of Open Access Journals (Sweden)

    Luis A. Hernández

    2013-03-01

    Full Text Available Photoluminescence (PL studies in GaN thin films grown by infrared close space vapor transport (CSVT-IR in vacuum are presented in this work. The growth of GaN thin films was done on a variety of substrates like silicon, sapphire and fused silica. Room temperature PL spectra of all the GaN films show near band-edge emission (NBE and a broad blue and green luminescence (BL, GL, which can be seen with the naked eye in a bright room. The sample grown by infrared CSVT on the silicon substrate shows several emission peaks from 2.4 to 3.22 eV with a pronounced red shift with respect to the band gap energy. The sample grown on sapphire shows strong and broad ultraviolet emission peaks (UVL centered at 3.19 eV and it exhibits a red shift of NBE. The PL spectrum of GaN films deposited on fused silica exhibited a unique and strong blue-green emission peak centered at 2.38 eV. The presence of yellow and green luminescence in all samples is related to native defects in the structure such as dislocations in GaN and/or the presence of amorphous phases. We analyze the material quality that can be obtained by CSVT-IR in vacuum, which is a high yield technique with simple equipment set-up, in terms of the PL results obtained in each case.

  16. Ni based planar Schottky diodes on gallium nitride (GaN) grown on sapphire

    Energy Technology Data Exchange (ETDEWEB)

    Menard, Olivier [Universite de Francois Rabelais, Laboratoire de Microelectronique de Puissance, 16 Rue Pierre et Marie Curie, BP7155, 37071 Tours (France); STMicroelectronics, 16 Rue Pierre et Marie Curie, BP7155, 37071 Tours (France); Cayrel, Frederic; Alquier, Daniel [Universite de Francois Rabelais, Laboratoire de Microelectronique de Puissance, 16 Rue Pierre et Marie Curie, BP7155, 37071 Tours (France); Collard, Emmanuel [STMicroelectronics, 16 Rue Pierre et Marie Curie, BP7155, 37071 Tours (France)

    2010-01-15

    In this work, Schottky barrier diodes (SBD), made using lift-off process, were realized on low doped n-type GaN grown by MOCVD. Schottky to Schottky structures were first realized, allowing to select convenient process parameters that reduce the leakage current, such as surface cleaning, thickness of the metallic contact and annealing time or temperature. Then, planar Schottky diodes were patterned and characterized to extract barrier height and ideality factor. Results show that good rectifying behaviour can be obtained with a 300nm thick Ni Schottky contact annealed in RTA at 450 C during 3 min under Argon. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  17. Electron transport properties of gallium nitride for microscopic power device modelling

    Energy Technology Data Exchange (ETDEWEB)

    Benbakhti, B [University of Glasgow, Glasgow, Scotland G12 8LT (United Kingdom); Rousseau, M; Soltani, A; Jaeger, J-C De, E-mail: brahim@elec.gla.ac.u [IEMN, Avenue Poincar, Villeneuve dAscq 59652 (France)

    2009-11-15

    The design of power GaN devices has to take into account the impact of temperature on device materials due to highly dissipated power and a consequent large self-heating. The accurate knowledge of transport properties as a function of the lattice temperature is essential in order to make a good thermal management to optimise the device performance. In this paper, accurate expressions describing the main transport properties as function of temperature and electric field for wurtzite GaN have been extracted starting from Monte Carlo simulations and then using a genetic algorithm. In particular, these expressions take into account the abrupt change in electron velocity slope at a low electric field ({approx}20 kV/cm). Using the same methodology, we have determined the temperature dependence of other physical parameters such as the low field mobility, saturation velocity, critical electric field and the corresponding peak velocity in a temperature range of 300 K - 700 K. The results show a very good agreement between the theoretical and experimental values.

  18. Elastic scattering by hot electrons and apparent lifetime of longitudinal optical phonons in gallium nitride

    Science.gov (United States)

    Khurgin, Jacob B.; Bajaj, Sanyam; Rajan, Siddharth

    2015-12-01

    Longitudinal optical (LO) phonons in GaN generated in the channel of high electron mobility transistors (HEMT) are shown to undergo nearly elastic scattering via collisions with hot electrons. The net result of these collisions is the diffusion of LO phonons in the Brillouin zone causing reduction of phonon and electron temperatures. This previously unexplored diffusion mechanism explicates how an increase in electron density causes reduction of the apparent lifetime of LO phonons, obtained from the time resolved Raman studies and microwave noise measurements, while the actual decay rate of the LO phonons remains unaffected by the carrier density. Therefore, the saturation velocity in GaN HEMT steadily declines with increased carrier density, in a qualitative agreement with experimental results.

  19. Development and evaluation of gallium nitride-based thin films for x-ray dosimetry

    Energy Technology Data Exchange (ETDEWEB)

    Hofstetter, Markus; Thalhammer, Stefan [Helmholtz Zentrum Muenchen, Ingolstaedter Landstrasse 1, 85764 Neuherberg (Germany); Howgate, John; Sharp, Ian D; Stutzmann, Martin, E-mail: stefan.thalhammer@helmholtz-muenchen.de [Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, 85748 Garching (Germany)

    2011-06-07

    X-ray radiation plays an important role in medical procedures ranging from diagnostics to therapeutics. Due to the harm such ionizing radiation can cause, it has become common practice to closely monitor the dosages received by patients. To this end, precise online dosimeters have been developed with the dual objectives of monitoring radiation in the region of interest and improving therapeutic methods. In this work, we evaluate GaN thin film high electron mobility heterostructures with sub-mm{sup 2} detection areas as x-ray radiation detectors. Devices were tested using 40-300 kV Bremsstrahlung x-ray sources. We find that the photoconductive device response exhibits a large gain, is almost independent of the angle of irradiation, and is constant to within 2% of the signal throughout this medical diagnostic x-ray range, indicating that these sensors do not require recalibration for geometry or energy. Furthermore, the devices show a high sensitivity to x-ray intensity and can measure in the air kerma rate (free-in-air) range of 1 {mu}Gy s{sup -1} to 10 mGy s{sup -1} with a signal stability of {+-}1% and a linear total dose response over time. Medical conditions were simulated by measurements of device responses to irradiation through human torso phantoms. Direct x-ray imaging is demonstrated using the index finger and wrist sections of a human phantom. The results presented here indicate that GaN-based thin film devices exhibit a wide range of properties, which make them promising candidates for dosimetry applications. In addition, with potential detection volumes smaller than 10{sup -6} cm{sup 3}, they are well suited for high-resolution x-ray imaging. Moreover, with additional engineering steps, these devices can be adapted to potentially provide both in vivo biosensing and x-ray dosimetry.

  20. Embedded Photonic Crystals in Gallium Nitride: MOCVD Growth and LED Design

    Science.gov (United States)

    Jewell, Jason Michael

    For a few years, a new wind measurement instrument has been competing with standard cup anemometers: wind LiDARs. Despite numerous advantages such as ease of deployment and the possibility to scan at multiple heights simultaneously, the performances of this instrument over complex terrain are still a matter of debate. This is mainly due to the flow homogeneity assumption made by the remote sensor which leads to a positive or a negative bias. The objective of this work was to implement a method to evaluate LiDAR bias over complex terrain using OpenFOAM. To accomplish this task, a CFD model capable of dealing with complex terrain and sparse forest was developed in OpenFOAM v1.7. A RANS approach coupled with a modified k-epsilon turbulence model accounting for extra turbulence generated by the forest was used. To estimate LiDAR bias, the method proposed by Bingol et al. (2008) was implemented as a post-processing tool. First, a simple verification of the model was carried out by modeling neutrally stratified boundary layer. Apart from the usual overshoot of k in the near-wall cells, results agreed well with analytical solutions. Then, the modifications brought to the solver to account for the effects of forest were validated. In order to do so, flow over and within a dense forest was modeled and results were compared to experimental data of Amiro (1990) and numerical results of Dalpe and Masson (2008). An innovative top boundary condition totally independent of the forest displacement height developed by Lussier-Clement (2012) was also validated. The experiment showed that, in the presence of forest, imposing fixed values for U, k and epsilon at the top of the domain is not appropriate. The LiDAR bias post-processing algorithm was also validated for flow over an isolated Gaussian hill. The effects of the scanning height as well as the slope of the hill were investigated. For terrain slopes ranging from ˜25% to ˜43%, LiDAR bias ranging from 2% up to 10% was observed. The generalization of the method for large areas revealed to be particulary useful at showing the extant of the bias. Finally, a real case scenario was studied where a LiDAR was sited in the Gaspe peninsula on a complex and densely forested terrain. The assessment of the CFD model for this site firstly revealed the significant impact of both the location and nature of the inlet boundary condition. Then, the LiDAR bias was estimated with the help of OpenFOAM v1.7, MeteoDyn WT 4.0 and WAsP Engineering. Numerical results were compared to experimental data. Despite the presence of terrain complexity up to a distance of eight times the radius of the scanned disc around the remote sensor, very little error was observed, suggesting that the LiDAR is only affected by topographic variations closer to the scanned volume.

  1. Optical properties of aluminium-gallium-nitride semiconductors; Optische Eigenschaften von Aluminium-Galliumnitrid-Halbleitern

    Energy Technology Data Exchange (ETDEWEB)

    Roeppischer, Marcus

    2011-08-17

    In this work fundamental optical properties of AlN, GaN and their alloys are presented. Spectroscopic ellipsometry from the near infrared (NIR) to the vacuum-ultraviolet (VUV) spectral region was the main tool to investigate these properties. The complete dielectric function (DF) of cubic as well as hexagonal GaN and AlN in the range between 0.6 eV and 20 eV is shown here, for the first time. A layer model including surface roughness and buffer layers was used to separate the DF of the investigated layer from the measured pseudo-DF. Afterwards all absorption structures in the DF's are discussed in detail. Due to the comparison with calculated bandstructures these absorption structures could be connected to interband transitions at high symmetry points in the Brillouin zone (BZ). Within this analysis similarities and differences between GaN and AlN are discussed. For zincblende (zb) AlN a pronounced absorption tail below the direct band gap transition was detected. This behaviour is typical for a phonon-assisted indirect absorption. In contrast zb-GaN exhibits a clear direct absorption. Furthermore, a change in the energetic position of the two main interband absorptions E1 and E2 at the L- and X-point of the BZ was found. A detailed analysis of the anisotropic fundamental band gap of hexagonal AlN offers a interchange of the two topmost valance bands at the BZ center compared to GaN. Due to this permutation the fundamental band edge of wurtzit (wz) AlN is only visible for parallel polarized light, while for GaN it can be detect in the perpendicular configuration. By analysing the energetic position of the three excitonic transitions the crystal-field- and spin-orbit-splitting were defined to be {delta}{sub cr}=-226 meV and {delta}{sub so}=14 meV. In addition, the energetic positions for these transitions at T=15 K are 6.0465 eV, 6.2694 eV and 6.2775 eV. The comparison between measurements at room and low temperature shows an energetic shift for both absorption edges of about 80 meV. By comparing the energetic positions of the excitonic transitions with the lattice parameters of different samples on silicon, sapphire and SiC substrate the influence of strain on the optical properties of wz-AlN was investigated. Due to this analysis the deformation potentials within the cubic approximation were calculated. Finally the spectral region below the fundamental band gap absorption of cubic AlGaN layers were studied. Therefore an analytical model was developed to calculate the dispersion in the transparent range for an arbitrary Al-content.

  2. Acidic ammonothermal growth of gallium nitride in a liner-free molybdenum alloy autoclave

    Science.gov (United States)

    Malkowski, Thomas F.; Pimputkar, Siddha; Speck, James S.; DenBaars, Steven P.; Nakamura, Shuji

    2016-12-01

    This paper discusses promising materials for use as internal, non-load bearing components as well as molybdenum-based alloys for autoclave structural components for an ammonothermal autoclave. An autoclave was constructed from the commercial titanium-zirconium-molybdenum (TZM) alloy and was found to be chemically inert and mechanically stable under acidic ammonothermal conditions. Preliminary seeded growth of GaN was demonstrated with negligible incorporation of transition metals (including molybdenum) into the grown material (560 °C). The possibility of a 'universal', inexpensive, liner-free ammonothermal autoclave capable of exposure to basic and acidic chemistry is demonstrated.

  3. Surfactant-Enabled Epitaxy of Smooth, Cubic Oxides on Gallium Nitride

    Science.gov (United States)

    Paisley, Elizabeth Aldret

    Epitaxial integration of polar oxides with polar semiconductors presents the possibility of tunable 2D charge carriers at polar interfaces and integration of non-linear dielectric properties if defect densities are low and interfaces are smooth. Achieving this in materials with highly dissimilar structure and symmetry remains a serious challenge and requires a dramatically improved understanding of chemically and structurally dissimilar interfaces and their synthesis. Current efforts to achieve such devices are impeded by the fact that many polar oxides have a close-packed cubic substructure that requires the oxide to grow along the {111} direction, which is compatible with hexagonal (0002) GaN. Since the {111} direction is not the lowest energy face for these oxides, conventional methods used to synthesize these oxides usually allow the interface to compensate by forming facets resulting in defects, detrimental to the sustaining interface conductivity. This thesis demonstrates a new methodology developed to allow in situ stabilization of desired crystallographic habits where water vapor is utilized during growth to hydroxylate the oxide (111) surfaces, changing the equilibrium habit from cubic to octahedral, eliminating the (100)-faceting tendency. Bulk thermodynamic calculations show that a hydroxide termination can stabilize the (111)-face. Further, Ca(OH)2 (the structure likely to represent such termination) provides a low-energy surface with six-fold symmetry and atomic registry matching {111}-CaO and GaN. Additionally, the relative free energies of formation for CaO and Ca(OH)2 provide an adequate processing window to avoid competition between oxide and hydroxide deposition. This approach is demonstrated for three model systems of rocksalt oxides grown along a polar direction on GaN: MgO, CaO, and lattice-matched compositions: Mg0.52Ca0.48O. MBE growth of smooth (111) CaO is demonstrated using RHEED intensity vs. time oscillations that show layer-by-layer growth for water vapor grown CaO up to ˜35 ML with AFM step heights consistent with one half of a unit cell distance (2.8 A) along [111]-CaO. X-ray diffraction o-circle full width half maximum values for the {111} CaO reflection are reduced from 0.3° to 0.2°, for the case of oxygen and water, respectively, suggesting the utility of the water surfactant growth mode to reduce the number of disordered secondary nucleation sites that contribute to crystalline mosaicity. Finally, metal-insulator-semiconductor capacitors show a 1000x increase in resistance for surfactant-assisted CaO films for film thicknesses as low as 4.5 nm. Because higher surfactant partial pressures are required to stabilize {111}-MgO, MBE deposition cannot access the processing space and PLD is required. Collaborative research with the Oak Ridge National Laboratory Center for Nanophase Materials Sciences was performed and similar outcomes were found, i.e., 2D growth and step-and-terrace morphology. This demonstrates the generic ability of this surfactant-strategy by two very different deposition techniques: equilibrium growth provided by MBE and the energetic plasma provided by PLD. For both materials, a companion set of temperature dependent ab initio surface energy calculations were introduced to aid in interpretation and understanding of our experimental observations. In both cases, there is noteworthy agreement between simulation and experiment for a temperature and pressure window where 2D growth may be supported. Finally, lattice-matched Mg-Ca-O alloys were also investigated and optimized for MBE and PLD water surfactant growth. I-V analysis shows 100x increase in resistance and TEM analysis suggests a commensurate oxide-GaN interface. Incorporating vapor phase surfactants to PVD enables one to approach semiconductor-grade heterostructures in materials systems where 2D growth was previously impossible. Though demonstrations at this point are limited to rocksalt oxides, this approach should apply to cubic/pseudocubic oxide perovskites (which share a common sublattice), enabling a pathway to overcome symmetry barriers that currently encumber heterostructure deposition between highly dissimilar materials.

  4. Gallium Nitride -based Microwave Power Varactors for Wireless Base Station Applications

    Science.gov (United States)

    Lu, Wei

    With the development of wireless communication systems, the demand for providing tunability in the wireless communication circuits becomes more and more intense. Among the technologies, semiconductor varactor is the critical component that is capable of implementing tunable and adaptive characteristics, particularly for the frond-end components of the wireless communication systems. For base station applications, high voltage handling capability, typically of 100 V or greater, high quality factor (Q), typically of above 100 at operation frequency, and high linearity, OIP3 > 65 dBm, are required. This work will mainly discuss in detail the design, fabrication and characterization to achieve the high-voltage high-Q and high-linearity microwave power varactors for wireless base station applications. Some preliminary varactor applications in the test tunable circuits will be demonstrated too. In this dissertation, we first introduce the physics of the semiconductor varactors and the motivation for choosing GaN as the candidate material for this microwave power varactor. Then we elucidate the critical design considerations for achieving high breakdown voltage, high quality factor and high linearity. The novel Schottky barrier engineered design using a thin InGaN surface layer on top of GaN to enhance the breakdown voltage of GaN-based Schottky diodes is therefore introduced. We then show the theoretical and experimental studies on the suppression mechanisms for electron tunneling in the InGaN/GaN Schottky barriers. The detailed material characterization for the InGaN/GaN material system and its application for the enhancement-mode HEMTs are also presented. Next, we discuss the initial device fabrication procedure and the improving methods based on the initial DC and RF measurement results. Thereafter, we report the detailed characterizations of the fabricated devices including the high-voltage I-V and C-V, S-parameters for 1-port and 2-port devices, linearity and application in the tunable resonant circuits. Finally, we summarize the dissertation and outline the future work. In this work, we achieved a high-performance GaN-based microwave power varactors with breakdown voltage > 100 V, quality factor > 100 and OIP3 > 71 dBm. It meets the initial goal of this project as well as the specifications in some practical applications. To the best of our knowledge, this combination of breakdown voltage, Q and OIP3 represents remarkable advancement from any other reported varactors.

  5. Contribution the scintigraphy with gallium 67 in the sarcoidosis; Apport de la scintigraphie au gallium 67 dans la sarcoidose

    Energy Technology Data Exchange (ETDEWEB)

    Elbez, I.; Sellem, A.; Rejeb, O.; Elkadri, N.; Hammami, H. [Service de medecine nucleaire, hopital militaire, Tunis, (Tunisia)

    2009-05-15

    The objective is to show the interest of the scintigraphy with citrates of gallium 67 in the diagnosis and follow up of sarcoidosis injuries. The conclusions are that the scintigraphy with gallium 67 constitutes an imaging technique of good performance, non invasive in the diagnosis, le injuries evaluation and the sarcoidosis follow-up. (N.C.)

  6. Theoretical Compton profile of diamond, boron nitride and carbon nitride

    Science.gov (United States)

    Aguiar, Julio C.; Quevedo, Carlos R.; Gomez, José M.; Di Rocco, Héctor O.

    2017-09-01

    In the present study, we used the generalized gradient approximation method to determine the electron wave functions and theoretical Compton profiles of the following super-hard materials: diamond, boron nitride (h-BN), and carbon nitride in its two known phases: βC3N4 and gC3N4 . In the case of diamond and h-BN, we compared our theoretical results with available experimental data. In addition, we used the Compton profile results to determine cohesive energies and found acceptable agreement with previous experiments.

  7. Mathematical Modelling of Nitride Layer Growth of Low Temperature Gas and Plasma Nitriding of AISI 316L

    Directory of Open Access Journals (Sweden)

    Triwiyanto A.

    2014-07-01

    Full Text Available This paper present mathematical model which developed to predict the nitrided layer thickness (case depth of gas nitrided and plasma nitrided austenitic stainless steel according to Fick’s first law for pure iron by adapting and manipulating the Hosseini’s model to fit the diffusion mechanism where nitrided structure formed by nitrided AISI 316L austenitic stainless steel. The mathematical model later tested against various actual gas nitriding and plasma nitriding experimental results with varying nitriding temperature and nitriding duration to see whether the model managed to successfully predict the nitrided layer thickness. This model predicted the coexistence of ε-Fe2-3N and γ΄-Fe4N under the present nitriding process parameters. After the validation process, it is proven that the mathematical model managed to predict the nitrided layer growth of the gas nitrided and plasma nitrided of AISI 316L SS up to high degree of accuracy.

  8. III-Nitride nanowire optoelectronics

    Science.gov (United States)

    Zhao, Songrui; Nguyen, Hieu P. T.; Kibria, Md. G.; Mi, Zetian

    2015-11-01

    Group-III nitride nanowire structures, including GaN, InN, AlN and their alloys, have been intensively studied in the past decade. Unique to this material system is that its energy bandgap can be tuned from the deep ultraviolet (~6.2 eV for AlN) to the near infrared (~0.65 eV for InN). In this article, we provide an overview on the recent progress made in III-nitride nanowire optoelectronic devices, including light emitting diodes, lasers, photodetectors, single photon sources, intraband devices, solar cells, and artificial photosynthesis. The present challenges and future prospects of III-nitride nanowire optoelectronic devices are also discussed.

  9. Patterned gallium surfaces as molecular mirrors.

    Science.gov (United States)

    Bossi, Alessandra; Rivetti, Claudio; Mangiarotti, Laura; Whitcombe, Michael J; Turner, Anthony P F; Piletsky, Sergey A

    2007-09-30

    An entirely new means of printing molecular information on a planar film, involving casting nanoscale impressions of the template protein molecules in molten gallium, is presented here for the first time. The metallic imprints not only replicate the shape and size of the proteins used as template. They also show specific binding for the template species. Such a simple approach to the creation of antibody-like properties in metallic mirrors can lead to applications in separations, microfluidic devices, and the development of new optical and electronic sensors, and will be of interest to chemists, materials scientists, analytical specialists, and electronic engineers.

  10. Theoretical luminescence spectra in p-type quantum wells and superlattices based on InGaAsN

    Energy Technology Data Exchange (ETDEWEB)

    Oliveira, Thiago Freire de; Rodrigues, Sara Cristina Pinto [Universidade Federal Rural de Pernambuco (UFRPE), Recife, PE (Brazil). Dept. de Fisica; Silva Junior, Eronides Felisberto da [Universidade Federal de Pernambuco (UFPE), Recife, PE (Brazil). Dept. de Fisica; Sipahi, Guilherme Matos [Universidade de Sao Paulo (IFSC/USP), Sao Carlos, SP (Brazil). Inst. de Fisica; Scolfaro, Luisa Maria Ribeiro [Texas State University, San Marcos, TX (United States), Dept. of Physics

    2012-07-01

    Full text: In the past few years, the dilute nitride system, InGaAsN, is proposed as a good candidate for several device applications. InGaAsN is considered a promising material for laser devices working at 1:3 or 1:5{mu}m and high-efficiency multijunction solar cells. Incorporation of In and N into GaAs result in a strong redshift of the emission wavelength. Besides, the strain can be minimized since the opposite effect of In and N on the lattice constant enables lattice matching of InGaAsN on GaAs. However, despite their great potential for applications, the understanding of their physical properties is rather incomplete. In particular, the dominant mechanisms of light emission in these alloys and their dependence on the nitrogen composition are not well established. Such information is crucial not only for a better understanding of the optical properties of the nitrogen containing III-V alloys, but also for a better technological control of alloy formation and optimization light emission efficiency. Another point concerns to investigation in p-type doping in InGaAsN. This is of great importance since, for example, can improve the transport in HBT (Heterojunction Bipolar Transistors) devices. In this work we report on theoretical luminescence spectra calculations for p-doped GaAs/InGaAsN quantum wells and superlattices. The calculations are performed within the k-vector.p-vector method by solving the full 8 x 8 Kane Hamiltonian, generalized to treat different materials. Strain effects due the lattice mismatch between InGaAsN and GaAs are taken into account. By varying the acceptor concentration we analyze the effect of exchange-correlation, which plays an important role in profile potential and electronic transition. These results can explain several important aspects about optical properties in these systems. (author)

  11. P–n junction diodes with polarization induced p-type graded In x Ga1–x N layer

    Science.gov (United States)

    Enatsu, Yuuki; Gupta, Chirag; Keller, Stacia; Nakamura, Shuji; Mishra, Umesh K.

    2017-10-01

    In this study, p–n junction diodes with polarization induced p-type layer are demonstrated on Ga polar (0001) bulk GaN substrates. A quasi-p-type region is obtained by linearly grading the indium composition in un-doped In x Ga1–x N layers from 0% to 5%, taking advantage of the piezoelectric and spontaneous polarization fields which exist in group III-nitride heterostructures grown in the typical (0001) or c-direction. The un-doped graded In x Ga1–x N layers needed to be capped with a thin Mg-doped In x Ga1–x N layer to make good ohmic contacts and to reduce the on-resistance of the p–n diodes. The Pol-p–n junction diodes exhibited similar characteristics compared to reference samples with traditional p-GaN:Mg layers. A rise in breakdown voltage from 30 to 110 V was observed when the thickness of the graded InGaN layer was increased from 100 to 600 nm at the same grade composition.

  12. Thermal effect mechanism of magnetoresistance in p-type diamond films

    Institute of Scientific and Technical Information of China (English)

    Qin Guo-Ping; Kong Chun-Yang; Ruan Hai-Bo; Huang Gui-Juan; Cui Yu-Ting; Fang Liang

    2010-01-01

    Based on the analysis and the discussion of the influence of thermal ionization energy and various scatterings on magnetoresistance(MR) of p-type diamond films, a revised model of valence band split-off over temperature is put forward, and a corresponding calculation formula is given for the MR of p-type diamond films (Corbino discs). It is shown that the theoretical calculation that the MR of diamond films changes with temperature is consistent with the experiment. The influence of Fermi energy level on MR of diamond films is discussed. Additionally, the thermal effect mechanism of MR in p-type diamond films is also explored.

  13. Characterization of plasma etching damage on p -type GaN using Schottky diodes

    OpenAIRE

    2008-01-01

    The plasma etching damage in p-type GaN has been characterized. From current-voltage and capacitance-voltage characteristics of Schottky diodes, it was revealed that inductively coupled plasma (ICP) etching causes an increase in series resistance of the Schottky diodes and compensation of acceptors in p-type GaN. We investigated deep levels near the valence band of p-type GaN using current deep level transient spectroscopy (DLTS), and no deep level originating from the ICP etching damage was ...

  14. Boron Nitride Nanoribbons from Exfoliation of Boron Nitride Nanotubes

    Science.gov (United States)

    Hung, Ching-Cheh; Hurst, Janet; Santiago, Diana

    2017-01-01

    Two types of boron nitride nanotubes (BNNTs) were exfoliated into boron nitride nanoribbons (BNNR), which were identified using transmission electron microscopy: (1) commercial BNNTs with thin tube walls and small diameters. Tube unzipping was indicated by a large decrease of the sample's surface area and volume for pores less than 2 nm in diameter. (2) BNNTs with large diameters and thick walls synthesized at NASA Glenn Research Center. Here, tube unraveling was indicated by a large increase in external surface area and pore volume. For both, the exfoliation process was similar to the previous reported method to exfoliate commercial hexagonal boron nitride (hBN): Mixtures of BNNT, FeCl3, and NaF (or KF) were sequentially treated in 250 to 350 C nitrogen for intercalation, 500 to 750 C air for exfoliation, and finally HCl for purification. Property changes of the nanosized boron nitride throughout this process were also similar to the previously observed changes of commercial hBN during the exfoliation process: Both crystal structure (x-ray diffraction data) and chemical properties (Fourier-transform infrared spectroscopy data) of the original reactant changed after intercalation and exfoliation, but most (not all) of these changes revert back to those of the reactant once the final, purified products are obtained.

  15. Compatibility of ITER candidate structural materials with static gallium

    Energy Technology Data Exchange (ETDEWEB)

    Luebbers, P.R.; Michaud, W.F.; Chopra, O.K.

    1993-12-01

    Tests were conducted on the compatibility of gallium with candidate structural materials for the International Thermonuclear Experimental Reactor, e.g., Type 316 SS, Inconel 625, and Nb-5 Mo-1 Zr alloy, as well as Armco iron, Nickel 270, and pure chromium. Type 316 stainless steel is least resistant to corrosion in static gallium and Nb-5 Mo-1 Zr alloy is most resistant. At 400{degrees}C, corrosion rates are {approx}4.0, 0.5, and 0.03 mm/yr for type 316 SS, Inconel 625, and Nb-5 Mo- 1 Zr alloy, respectively. The pure metals react rapidly with gallium. In contrast to findings in earlier studies, pure iron shows greater corrosion than nickel. The corrosion rates at 400{degrees}C are {ge}88 and 18 mm/yr, respectively, for Armco iron and Nickel 270. The results indicate that at temperatures up to 400{degrees}C, corrosion occurs primarily by dissolution and is accompanied by formation of metal/gallium intermetallic compounds. The solubility data for pure metals and oxygen in gallium are reviewed. The physical, chemical, and radioactive properties of gallium are also presented. The supply and availability of gallium, as well as price predictions through the year 2020, are summarized.

  16. The effect of gallium nitrate on synoviocyte MMP activity.

    Science.gov (United States)

    Panagakos, F S; Kumar, E; Venescar, C; Guidon, P

    2000-02-01

    Gallium, a group IIIa metal salt, has been demonstrated to be an effective immunosuppressive agent. Gallium has also been shown to inhibit the production of inflammatory cytokines, such as IL-1beta, produced by macrophage-like cells in vitro. To further characterize the effects of gallium on the inflammatory process, we examined the effects of gallium nitrate on matrix metalloproteinase (MMP) activity utilizing the rabbit synoviocyte cell line HIG-82. HIG-82 cells were incubated with IL-1beta and TPA, with and without increasing concentrations of gallium nitrate. Conditioned medium was collected and assayed for MMP activity using a synthetic substrate and substrate gel zymography. IL-1beta and TPA alone induced MMP activity in HIG-82 cells. A dose-dependent inhibition of IL-1beta and TPA stimulated MMP activity by gallium nitrate at increasing concentrations was observed. This study demonstrates that gallium nitrate can inhibit the activity of MMPs and may be useful as a modulator of inflammation in arthritis.

  17. Gallium vacancies in β-Ga2O3 crystals

    Science.gov (United States)

    Kananen, B. E.; Halliburton, L. E.; Stevens, K. T.; Foundos, G. K.; Giles, N. C.

    2017-05-01

    The gallium vacancy, an intrinsic acceptor, is identified in β-Ga2O3 using electron paramagnetic resonance (EPR). Spectra from doubly ionized ( VG a 2 - ) and singly ionized ( VG a - ) gallium vacancies are observed at room temperature, without photoexcitation, after an irradiation with high-energy neutrons. The VG a 2 - centers (with S = 1/2) have a slight angular variation due to a small anisotropy in the g matrix (principal values are 2.0034, 2.0097, and 2.0322). The VG a 2 - centers also exhibit a resolved hyperfine structure due to equal and nearly isotropic interactions with the 69,71Ga nuclei at two Ga sites (the hyperfine parameters are 1.28 and 1.63 mT for the 69Ga and 71Ga nuclei, respectively, when the field is along the a direction). Based on these g-matrix and hyperfine results, the model for the ground state of the doubly ionized vacancy ( VG a 2 - ) has a hole localized on one threefold-coordinated oxygen ion. The vacancy is located at one of the three neighboring gallium sites, and the remaining two gallium neighbors are responsible for the equal hyperfine interactions. The singly ionized ( VG a - ) gallium vacancies are also paramagnetic. In this latter acceptor, the two holes are localized on separate oxygen ions adjacent to one gallium vacancy. Their spins align parallel to give a triplet S = 1 EPR spectrum with resolved hyperfine structure from interactions with gallium neighbors.

  18. Origin of the p-type character of AuCl3 functionalized carbon nanotubes

    KAUST Repository

    Murat, Altynbek

    2014-02-13

    The microscopic origin of the p-type character of AuCl3 functionalized carbon nanotubes (CNTs) is investigated using first-principles self-interaction corrected density functional theory (DFT). Recent DFT calculations suggest that the p-type character of AuCl3 functionalized CNTs is due to the Cl atoms adsorbed on the CNTs. We test this hypothesis and show that adsorbed Cl atoms only lead to a p-type character for very specific concentrations and arrangements of the Cl atoms, which furthermore are not the lowest energy configurations. We therefore investigate alternative mechanisms and conclude that the p-type character is due to the adsorption of AuCl4 molecules. The unraveling of the exact nature of the p-doping adsorbates is a key step for further development of AuCl3 functionalized CNTs in water sensor applications. © 2014 American Chemical Society.

  19. Theoretical prediction of p-type transparent conductivity in Zn-doped TiO2.

    Science.gov (United States)

    Han, Xiaoping; Shao, Guosheng

    2013-06-28

    It is very difficult and yet extremely important to fill the wide technological gap in developing transparent conducting oxides (TCOs) that exhibit excellent p-type conducting characteristics. Here, on the basis of extensive first-principles calculations, we discover for the first time potentially promising p-type transparent conductivity in Zn-doped TiO2 under oxygen rich conditions. Efforts have been made to elaborate the effects of possible defects and their interaction with Zn doping on the p-type transparent conductivity. This work offers a fundamental road map for cost-effective development of p-type TCOs based on TiO2, which is a cheap and stable material system of large natural resources.

  20. Growth and characterization of indium antimonide and gallium antimonide crystals

    Indian Academy of Sciences (India)

    N K Udayashankar; H L Bhat

    2001-10-01

    Indium antimonide and gallium antimonide were synthesized from the respective component elements using an indigenously fabricated synthesis unit. Bulk crystals of indium antimonide and gallium antimonide were grown using both the vertical and horizontal Bridgman techniques. Effect of ampoule shapes and diameters on the crystallinity and homogeneity was studied. The grown crystals were characterized using X-ray analysis, EDAX, chemical etching, Hall effect and conductivity measurements. In the case of gallium antimonide, effect of dopants (Te and In) on transport and photoluminescence properties was investigated.

  1. Origin and evolution of metal P-type ATPases in Plantae (Archaeplastida)

    OpenAIRE

    2014-01-01

    Metal ATPases are a subfamily of P-type ATPases involved in the transport of metal cations across biological membranes. They all share an architecture featuring eight transmembrane domains in pairs of two and are found in prokaryotes as well as in a variety of Eukaryotes. In Arabidopsis thaliana, eight metal P-type ATPases have been described, four being specific to copper transport and four displaying a broader metal specificity, including zinc, cadmium and possibly copper and calcium. So fa...

  2. Investigation into nitrided spur gears

    Energy Technology Data Exchange (ETDEWEB)

    Yilbas, B.S.; Coban, A.; Nickel, J.; Sunar, M.; Sami, M.; Abdul Aleem, B.J. [King Fahd Univ. of Petroleum and Minerals, Dhahran (Saudi Arabia)

    1996-12-01

    The cold forging method has been widely used in industry to produce machine parts. In general, gears are produced by shaping or hobbing. One of the shaping techniques is precision forging, which has several advantages over hobbing. In the present study, cold forging of spur gears from Ti-6Al-4V material is introduced. To improve the surface properties of the resulting gears, plasma nitriding was carried out. Nuclear reaction analysis was carried out to obtain the nitrogen concentration, while the micro-PIXE technique was used to determine the elemental distribution in the matrix after forging and nitriding processes. Scanning electron microscopy and x-ray powder diffraction were used to investigate the metallurgical changes and formation of nitride components in the surface region. Microhardness and friction tests were carried out to measure the hardness depth profile and friction coefficient at the surface. Finally, scoring failure tests were conducted to determine the rotational speed at which the gears failed. Three distinct regions were obtained in the nitride region, and at the initial stages of the scoring tests, failure in surface roughness was observed in the vicinity of the tip of the gear tooth. This occurred at a particular rotational speed and work input.

  3. Investigation into nitrided spur gears

    Science.gov (United States)

    Yilbas, B. S.; Coban, A.; Nickel, J.; Sunar, M.; Sami, M.; Aleem, B. J. Abdul

    1996-12-01

    The cold forging method has been widely used in industry to produce machine parts. In general, gears are produced by shaping or hobbing. One of the shaping techniques is precision forging, which has several advantages over hobbing. In the present study, cold forging of spur gears from Ti-6A1-4V material is introduced. To improve the surface properties of the resulting gears, plasma nitriding was carried out. Nuclear reaction analysis was carried out to obtain the nitrogen concentration, while the micro-PIXE technique was used to determine the elemental distribution in the matrix after forging and nitriding processes. Scanning electron microscopy and x-ray powder diffraction were used to investigate the metallurgical changes and formation of nitride components in the surface region. Microhardness and friction tests were carried out to measure the hardness depth profile and friction coefficient at the surface. Finally, scoring failure tests were conducted to determine the rotational speed at which the gears failed. Three distinct regions were obtained in the nitride region, and at the initial stages of the scoring tests, failure in surface roughness was observed in the vicinity of the tip of the gear tooth. This occurred at a particular rotational speed and work input.

  4. Convergence of valence bands for high thermoelectric performance for p-type InN

    Science.gov (United States)

    Li, Hai-Zhu; Li, Ruo-Ping; Liu, Jun-Hui; Huang, Ming-Ju

    2015-12-01

    Band engineering to converge the bands to achieve high valley degeneracy is one of effective approaches for designing ideal thermoelectric materials. Convergence of many valleys in the valence band may lead to a high Seebeck coefficient, and induce promising thermoelectric performance of p-type InN. In the current work, we have systematically investigated the electronic structure and thermoelectric performance of wurtzite InN by using the density functional theory combined with semiclassical Boltzmann transport theory. Form the results, it can be found that intrinsic InN has a large Seebeck coefficient (254 μV/K) and the largest value of ZeT is 0.77. The transport properties of p-type InN are better than that of n-type one at the optimum carrier concentration, which mainly due to the large Seebeck coefficient for p-type InN, although the electrical conductivity of n-type InN is larger than that of p-type one. We found that the larger Seebeck coefficient for p-type InN may originate from the large valley degeneracy in the valence band. Moreover, the low minimum lattice thermal conductivity for InN is one key factor to become a good thermoelectric material. Therefore, p-type InN could be a potential material for further applications in the thermoelectric area.

  5. Effect of oxidation on the Mechanical Properties of Liquid Gallium and Eutectic Gallium-Indium

    CERN Document Server

    Xu, Qin; Guo, Qiti; Jaeger, Heinrich; Brown, Eric

    2012-01-01

    Liquid metals exhibit remarkable mechanical properties, in particular large surface tension and low viscosity. However, these properties are greatly affected by oxidation when exposed to air. We measure the viscosity, surface tension, and contact angle of gallium (Ga) and a eutectic gallium-indium alloy (eGaIn) while controlling such oxidation by surrounding the metal with an acid bath of variable concentration. Rheometry measurements reveal a yield stress directly attributable to an oxide skin that obscures the intrinsic behavior of the liquid metals. We demonstrate how the intrinsic viscosity can be obtained with precision through a scaling technique that collapses low- and high-Reynolds number data. Measuring surface tension with a pendant drop method, we show that the oxide skin generates a surface stress that mimics surface tension and develop a simple model to relate this to the yield stress obtained from rheometry. We find that yield stress, surface tension, and contact angle all transition from solid-...

  6. Group III-nitride lasers: a materials perspective

    Directory of Open Access Journals (Sweden)

    Matthew T. Hardy

    2011-09-01

    Full Text Available An overview of III-Nitride based laser diodes (LDs is presented focusing on the materials challenges in each phase of device development. We discuss early breakthroughs leading to the first commercial GaN LDs, covering crystal growth, p-type doping, and defect reduction. Additional device issues, such as polarization effects, strain, and index dispersion are addressed as they apply to the development of blue and green LDs for pico-projector applications. State of the art device results are highlighted. Devices grown on non-polar and semi-polar GaN substrates address many polarization related problems present in c-plane GaN growth. Device results, advantages, and limitations of various non-polar and semi-polar systems are discussed in terms of polarization properties, Indium incorporation, extended defect formation, and critical thickness. A brief description of challenges and progress in UV LDs is also presented.

  7. III-V nitride semiconductors for solar hydrogen production

    Science.gov (United States)

    Parameshwaran, Vijay; Gallinat, Chad; Enck, Ryan W.; Sampath, Anand V.; Shen, Paul H.; Kuykendall, Tevye; Aloni, Shaul; Wraback, Michael; Clemens, Bruce M.

    2012-06-01

    Photoelectrochemical cells are devices that can convert solar radiation to hydrogen gas through a water decomposition process. In this process, energy is converted from incident photons to the bonds of the generated H2 molecules. The solar radiation absorption, electron-hole pair splitting, and photoelectrolysis half reactions all occur in the vicinity of the electrode-electrolyte interface. As a result, engineering the electrode material and its interaction with the electrolyte is important in investigating and improving the energy conversion process in these devices. III-V nitride materials are promising candidates for photoelectrochemical energy applications. We demonstrate solar-to-hydrogen conversion in these cells using p-type GaN and n-type InGaN as a photocathode and photoanode material, respectively. Additionally, we demonstrate heteroepitaxial MOCVD growth of GaP on Si, enabling future work in developing GaPN as a photocathode material.

  8. Role of defects in III-nitride based electronics

    Energy Technology Data Exchange (ETDEWEB)

    HAN,JUNG; MYERS JR.,SAMUEL M.; FOLLSTAEDT,DAVID M.; WRIGHT,ALAN F.; CRAWFORD,MARY H.; LEE,STEPHEN R.; SEAGER,CARLETON H.; SHUL,RANDY J.; BACA,ALBERT G.

    2000-01-01

    The LDRD entitled ``Role of Defects in III-Nitride Based Devices'' is aimed to place Sandia National Laboratory at the forefront of the field of GaN materials and devices by establishing a scientific foundation in areas such as material growth, defect characterization/modeling, and processing (metalization and etching) chemistry. In this SAND report the authors summarize their studies such as (1) the MOCVD growth and doping of GaN and AlGaN, (2) the characterization and modeling of hydrogen in GaN, including its bonding, diffusion, and activation behaviors, (3) the calculation of energetic of various defects including planar stacking faults, threading dislocations, and point defects in GaN, and (4) dry etching (plasma etching) of GaN (n- and p-types) and AlGaN. The result of the first AlGaN/GaN heterojunction bipolar transistor is also presented.

  9. Superlattice Intermediate Band Solar Cell on Gallium Arsenide

    Science.gov (United States)

    2015-02-09

    AFRL-RV-PS- AFRL-RV-PS- TR-2015-0048 TR-2015-0048 SUPERLATTICE INTERMEDIATE BAND SOLAR CELL ON GALLIUM ARSENIDE Alexandre Freundlich...SUBTITLE 5a. CONTRACT NUMBER FA9453-13-1-0232 Superlattice Intermediate Band Solar Cell on Gallium Arsenide 5b. GRANT NUMBER 5c. PROGRAM ELEMENT NUMBER...band solar cell incorporating low dimensional structures made with dilute nitrogen alloys of III-V semiconductors is investigated theoretically and

  10. The new Polish nitriding and nitriding like processes in the modern technology

    Energy Technology Data Exchange (ETDEWEB)

    Has, Z.; Kula, P. [Technical Univ. of Lodz (Poland)

    1995-12-31

    Modern technological methods for making nitrided layers and low-friction combined layers have been described. The possibilities of structures and properties forming were analyzed as well as the area and examples of application were considered. Nitrided layers are applied in high loaded frictional couples, widely. They can be formed on steel or cast iron machine parts by the classic gas nitriding process or by modern numerous nitriding technologies.

  11. Recovery of gallium from coal fly ash by a dual reactive extraction process

    Energy Technology Data Exchange (ETDEWEB)

    Gutierrez, B.; Pazos, C.; Coca, J. [University of Oviedo, Oviedo (Spain). Dept. of Chemical Engineering and Environmental Technology

    1997-08-01

    This paper describes the extraction of gallium from coal fly ash by leaching and extraction with commercial extractants Amerlite LA-2 and LIX-54N dissolved in kerosene. Leaching of gallium and other metals from the fly ash was carried out with 6 M hydrochloric acid. The leaching liquor is first contacted with Amerlite LA-2 which extracts the gallium and iron. The iron is then precipitated with sodium hydroxide, while gallium remains in solution. Gallium is extracted selectively from the base solution with LIX 54; the resulting stripped solution contains 83% of the gallium present in the leaching liquor.

  12. Fabrication and Characterization of a Ruthenium Nitride Membrane for Electrochemical pH Sensors

    Directory of Open Access Journals (Sweden)

    Yi-Hung Liao

    2009-04-01

    Full Text Available ThepH sensing and nonideal characteristics of a ruthenium nitride (RuN sensing membrane pH sensor were investigated. RuN thin films were deposited from a 99.9% ruthenium target on p-type silicon substrates using radio frequency (r.f. sputtering with N2 gas. Subsequently, the nanometric structure and surface morphology of RuN thin films were determined. The sensitivity of the RuN sensing membrane pH sensor was 58.03 mV/pH, obtained from ID-VG curves with a current-voltage (I-V measurement system in standard buffer solutions from pH 1 to pH 13 at room temperature (25 °C. Moreover, the nonideal characteristics of the RuN sensing membrane, such as temperature coefficient, drift with light influence, drift rate and hysteresis width, etc. were also investigated. Finally, the sensing characteristics of the RuN membrane were compared with titanium nitride (TiN, aluminum nitride (AlN and silicon nitride (Si3N4 membranes.

  13. Inhalation developmental toxicology studies: Gallium arsenide in mice and rats

    Energy Technology Data Exchange (ETDEWEB)

    Mast, T.J.; Greenspan, B.J.; Dill, J.A.; Stoney, K.H.; Evanoff, J.J.; Rommereim, R.L.

    1990-12-01

    Gallium arsenide is a crystalline compound used extensively in the semiconductor industry. Workers preparing solar cells and gallium arsenide ingots and wafers are potentially at risk from the inhalation of gallium arsenide dust. The potential for gallium arsenide to cause developmental toxicity was assessed in Sprague- Dawley rats and CD-1 (Swiss) mice exposed to 0, 10, 37, or 75 mg/m{sup 3} gallium arsenide, 6 h/day, 7 days/week. Each of the four treatment groups consisted of 10 virgin females (for comparison), and {approx}30 positively mated rats or {approx}24 positively mated mice. Mice were exposed on 4--17 days of gestation (dg), and rats on 4--19 dg. The day of plug or sperm detection was designated as 0 dg. Body weights were obtained throughout the study period, and uterine and fetal body weights were obtained at sacrifice (rats, 20 dg; mice, 18 dg). Implants were enumerated and their status recorded. Live fetuses were sexed and examined for gross, visceral, skeletal, and soft-tissue craniofacial defects. Gallium and arsenic concentrations were determined in the maternal blood and uterine contents of the rats (3/group) at 7, 14, and 20 dg. 37 refs., 11 figs., 30 tabs.

  14. Handling characteristics of gallium alloy for dental restoration.

    Science.gov (United States)

    Mash, L K; Miller, B H; Nakajima, H; Collard, S M; Guo, I Y; Okabe, T

    1993-12-01

    The handling characteristics of a gallium alloy (Gallium Alloy GF) were compared to those of a spherical high-copper amalgam (Tytin). Ten dentists each restored four identical MO preparations in acrylic typodont teeth (no. 30), two with amalgam and two with gallium alloy. Each restoration was evaluated immediately following completion by the operator for six clinically relevant criteria. Each criterion was scored between 1 and 5, where 1 = very poor, 2 = poor, 3 = fair, 4 = good, and 5 = very good. Three two-sided Mann-Whitney tests were used to compare the median scores for significant differences (P < 0.05). The first test indicated no significant difference between scores for the first- and second-placed restorations, within criteria and within alloy type (n = 10). The second test indicated a significant difference between amalgam and gallium alloy, within criteria and within restoration sequence (n = 10), for each criterion except resistance to fracture during removal of the matrix band. The third test indicated a significant difference between amalgam and gallium alloy, within each criteria, combining scores for first- and second-placed restorations (n = 20). During simulated clinical placement, amalgam was rated significantly higher than gallium alloy in each handling characteristic evaluated.

  15. Formation of p-type ZnO thin film through co-implantation

    Science.gov (United States)

    Chuang, Yao-Teng; Liou, Jhe-Wei; Woon, Wei-Yen

    2017-01-01

    We present a study on the formation of p-type ZnO thin film through ion implantation. Group V dopants (N, P) with different ionic radii are implanted into chemical vapor deposition grown ZnO thin film on GaN/sapphire substrates prior to thermal activation. It is found that mono-doped ZnO by N+ implantation results in n-type conductivity under thermal activation. Dual-doped ZnO film with a N:P ion implantation dose ratio of 4:1 is found to be p-type under certain thermal activation conditions. Higher p-type activation levels (1019 cm-3) under a wider thermal activation range are found for the N/P dual-doped ZnO film co-implanted by additional oxygen ions. From high resolution x-ray diffraction and x-ray photoelectron spectroscopy it is concluded that the observed p-type conductivities are a result of the promoted formation of PZn-4NO complex defects via the concurrent substitution of nitrogen at oxygen sites and phosphorus at zinc sites. The enhanced solubility and stability of acceptor defects in oxygen co-implanted dual-doped ZnO film are related to the reduction of oxygen vacancy defects at the surface. Our study demonstrates the prospect of the formation of stable p-type ZnO film through co-implantation.

  16. Nanostructured p-Type Semiconductor Electrodes and Photoelectrochemistry of Their Reduction Processes

    Directory of Open Access Journals (Sweden)

    Matteo Bonomo

    2016-05-01

    Full Text Available This review reports the properties of p-type semiconductors with nanostructured features employed as photocathodes in photoelectrochemical cells (PECs. Light absorption is crucial for the activation of the reduction processes occurring at the p-type electrode either in the pristine or in a modified/sensitized state. Beside thermodynamics, the kinetics of the electron transfer (ET process from photocathode to a redox shuttle in the oxidized form are also crucial since the flow of electrons will take place correctly if the ET rate will overcome that one of recombination and trapping events which impede the charge separation produced by the absorption of light. Depending on the nature of the chromophore, i.e., if the semiconductor itself or the chemisorbed dye-sensitizer, different energy levels will be involved in the cathodic ET process. An analysis of the general properties and requirements of electrodic materials of p-type for being efficient photoelectrocatalysts of reduction processes in dye-sensitized solar cells (DSC will be given. The working principle of p-type DSCs will be described and extended to other p-type PECs conceived and developed for the conversion of the solar radiation into chemical products of energetic/chemical interest like non fossil fuels or derivatives of carbon dioxide.

  17. Recent Developments in p-Type Oxide Semiconductor Materials and Devices

    KAUST Repository

    Wang, Zhenwei

    2016-02-16

    The development of transparent p-type oxide semiconductors with good performance may be a true enabler for a variety of applications where transparency, power efficiency, and greater circuit complexity are needed. Such applications include transparent electronics, displays, sensors, photovoltaics, memristors, and electrochromics. Hence, here, recent developments in materials and devices based on p-type oxide semiconductors are reviewed, including ternary Cu-bearing oxides, binary copper oxides, tin monoxide, spinel oxides, and nickel oxides. The crystal and electronic structures of these materials are discussed, along with approaches to enhance valence-band dispersion to reduce effective mass and increase mobility. Strategies to reduce interfacial defects, off-state current, and material instability are suggested. Furthermore, it is shown that promising progress has been made in the performance of various types of devices based on p-type oxides. Several innovative approaches exist to fabricate transparent complementary metal oxide semiconductor (CMOS) devices, including novel device fabrication schemes and utilization of surface chemistry effects, resulting in good inverter gains. However, despite recent developments, p-type oxides still lag in performance behind their n-type counterparts, which have entered volume production in the display market. Recent successes along with the hurdles that stand in the way of commercial success of p-type oxide semiconductors are presented.

  18. CuNb3O8: A p-Type Semiconducting Metal Oxide Photoelectrode.

    Science.gov (United States)

    Joshi, Upendra A; Maggard, Paul A

    2012-06-07

    A new p-type CuNb3O8 polycrystalline photoelectrode was investigated and was determined to have indirect and direct bandgap sizes of 1.26 and 1.47 eV, respectively. The p-type polycrystalline film could be prepared on fluorine-doped tin oxide glass and yielded a cathodic photocurrent under visible-light irradiation (λ > 420 nm) with incident photon-to-current efficiencies of up to ∼6-7% and concomitant hydrogen evolution. A Mott-Schottky analysis yielded a flat band potential of +0.35 V versus RHE (pH = 6.3) and a calculated p-type dopant concentration of ∼7.2 × 10(15) cm(-3). The conduction band energies are found to be negative enough for the reduction of water under visible light irradiation. A hole mobility of ∼145 cm(2)/V·s was obtained from J(I)-V(2) measurements using the Mott-Gurney relation, which is ∼50% higher than that typically found for p-type Cu2O. DFT-based electronic structure calculations were used to probe the atomic and structural origins of the band gap transitions and carrier mobility. Thus, a new p-type semiconductor is discovered for potential applications in solar energy conversion.

  19. Chemical-free n-type and p-type multilayer-graphene transistors

    Energy Technology Data Exchange (ETDEWEB)

    Dissanayake, D. M. N. M., E-mail: nandithad@voxtel-inc.com [Voxtel Inc, Lockey Laboratories, University of Oregon, Eugene Oregon 97402 (United States); Eisaman, M. D. [Sustainable Energy Technologies Department, Brookhaven National Laboratory, Upton, New York 11973 (United States); Department of Electrical and Computer Engineering, Stony Brook University, Stony Brook, New York 11794 (United States); Department of Physics and Astronomy, Stony Brook University, Stony Brook, New York 11794 (United States)

    2016-08-01

    A single-step doping method to fabricate n- and p-type multilayer graphene (MG) top-gate field effect transistors (GFETs) is demonstrated. The transistors are fabricated on soda-lime glass substrates, with the n-type doping of MG caused by the sodium in the substrate without the addition of external chemicals. Placing a hydrogen silsesquioxane (HSQ) barrier layer between the MG and the substrate blocks the n-doping, resulting in p-type doping of the MG above regions patterned with HSQ. The HSQ is deposited in a single fabrication step using electron beam lithography, allowing the patterning of arbitrary sub-micron spatial patterns of n- and p-type doping. When a MG channel is deposited partially on the barrier and partially on the glass substrate, a p-type and n-type doping profile is created, which is used for fabricating complementary transistors pairs. Unlike chemically doped GFETs in which the external dopants are typically introduced from the top, these substrate doped GFETs allow for a top gate which gives a stronger electrostatic coupling to the channel, reducing the operating gate bias. Overall, this method enables scalable fabrication of n- and p-type complementary top-gated GFETs with high spatial resolution for graphene microelectronic applications.

  20. Recent Developments in p-Type Oxide Semiconductor Materials and Devices.

    Science.gov (United States)

    Wang, Zhenwei; Nayak, Pradipta K; Caraveo-Frescas, Jesus A; Alshareef, Husam N

    2016-05-01

    The development of transparent p-type oxide semiconductors with good performance may be a true enabler for a variety of applications where transparency, power efficiency, and greater circuit complexity are needed. Such applications include transparent electronics, displays, sensors, photovoltaics, memristors, and electrochromics. Hence, here, recent developments in materials and devices based on p-type oxide semiconductors are reviewed, including ternary Cu-bearing oxides, binary copper oxides, tin monoxide, spinel oxides, and nickel oxides. The crystal and electronic structures of these materials are discussed, along with approaches to enhance valence-band dispersion to reduce effective mass and increase mobility. Strategies to reduce interfacial defects, off-state current, and material instability are suggested. Furthermore, it is shown that promising progress has been made in the performance of various types of devices based on p-type oxides. Several innovative approaches exist to fabricate transparent complementary metal oxide semiconductor (CMOS) devices, including novel device fabrication schemes and utilization of surface chemistry effects, resulting in good inverter gains. However, despite recent developments, p-type oxides still lag in performance behind their n-type counterparts, which have entered volume production in the display market. Recent successes along with the hurdles that stand in the way of commercial success of p-type oxide semiconductors are presented.

  1. Phase identification of iron nitrides and iron oxy-nitrides with Mossbauer spectroscopy

    NARCIS (Netherlands)

    Borsa, DM; Boerma, DO

    2003-01-01

    The Mossbauer spectroscopy of all known Fe nitrides is the topic of this paper. Most of the data were accumulated during a study of the growth of the various Fe nitride phases using molecular beam epitaxy of Fe in the presence of a flux of atomic N, or by post-nitriding freshly grown Fe layers also

  2. Composite Reinforcement using Boron Nitride Nanotubes

    Science.gov (United States)

    2014-05-09

    Final 3. DATES COVERED (From - To) 11-Mar-2013 to 10-Mar-2014 4. TITLE AND SUBTITLE Composite Reinforcement using Boron Nitride Nanotubes...AVAILABILITY STATEMENT Approved for public release. 13. SUPPLEMENTARY NOTES 14. ABSTRACT Boron nitride nanotubes have been proposed as a...and titanium (Ti) metal clusters with boron nitride nanotubes (BNNT). First-principles density-functional theory plus dispersion (DFT-D) calculations

  3. Analysis of plasma-nitrided steels

    Science.gov (United States)

    Salik, J.; Ferrante, J.; Honecy, F.; Hoffman, R., Jr.

    1986-01-01

    The analysis of plasma nitrided steels can be divided to two main categories - structural and chemical. Structural analysis can provide information not only on the hardening mechanisms but also on the fundamental processes involved. Chemical analysis can be used to study the kinetics for the nitriding process and its mechanisms. In this paper preliminary results obtained by several techniques of both categories are presented and the applicability of those techniques to the analysis of plasma-nitrided steels is discussed.

  4. Transparent conducting oxide clad limited area epitaxy semipolar III-nitride laser diodes

    Science.gov (United States)

    Myzaferi, A.; Reading, A. H.; Cohen, D. A.; Farrell, R. M.; Nakamura, S.; Speck, J. S.; DenBaars, S. P.

    2016-08-01

    The bottom cladding design of semipolar III-nitride laser diodes is limited by stress relaxation via misfit dislocations that form via the glide of pre-existing threading dislocations (TDs), whereas the top cladding is limited by the growth time and temperature of the p-type layers. These design limitations have individually been addressed by using limited area epitaxy (LAE) to block TD glide in n-type AlGaN bottom cladding layers and by using transparent conducting oxide (TCO) top cladding layers to reduce the growth time and temperature of the p-type layers. In addition, a TCO-based top cladding should have significantly lower resistivity than a conventional p-type (Al)GaN top cladding. In this work, LAE and indium-tin-oxide cladding layers are used simultaneously in a ( 20 2 ¯ 1 ) III-nitride laser structure. Lasing was achieved at 446 nm with a threshold current density of 8.5 kA/cm2 and a threshold voltage of 8.4 V.

  5. Transparent conducting oxide clad limited area epitaxy semipolar III-nitride laser diodes

    KAUST Repository

    Myzaferi, A.

    2016-08-11

    The bottom cladding design of semipolar III-nitride laser diodes is limited by stress relaxation via misfit dislocations that form via the glide of pre-existing threading dislocations (TDs), whereas the top cladding is limited by the growth time and temperature of the p-type layers. These design limitations have individually been addressed by using limited area epitaxy (LAE) to block TD glide in n-type AlGaN bottom cladding layers and by using transparent conducting oxide (TCO) top cladding layers to reduce the growth time and temperature of the p-type layers. In addition, a TCO-based top cladding should have significantly lower resistivity than a conventional p-type (Al)GaN top cladding. In this work, LAE and indium-tin-oxide cladding layers are used simultaneously in a (202⎯⎯1) III-nitride laser structure. Lasing was achieved at 446 nm with a threshold current density of 8.5 kA/cm2 and a threshold voltage of 8.4 V.

  6. Transparent p-type SnO nanowires with unprecedented hole mobility among oxide semiconductors

    KAUST Repository

    Caraveo-Frescas, J. A.

    2013-11-25

    p-type tin monoxide (SnO) nanowire field-effect transistors with stable enhancement mode behavior and record performance are demonstrated at 160 °C. The nanowire transistors exhibit the highest field-effect hole mobility (10.83 cm2 V−1 s−1) of any p-type oxide semiconductor processed at similar temperature. Compared to thin film transistors, the SnO nanowire transistors exhibit five times higher mobility and one order of magnitude lower subthreshold swing. The SnO nanowire transistors show three times lower threshold voltages (−1 V) than the best reported SnO thin film transistors and fifteen times smaller than p-type Cu 2O nanowire transistors. Gate dielectric and process temperature are critical to achieving such performance.

  7. DyP-type peroxidases comprise a novel heme peroxidase family.

    Science.gov (United States)

    Sugano, Y

    2009-04-01

    Dye-decolorizing peroxidase (DyP) is produced by a basidiomycete (Thanatephorus cucumeris Dec 1) and is a member of a novel heme peroxidase family (DyP-type peroxidase family) that appears to be distinct from general peroxidases. Thus far, 80 putative members of this family have been registered in the PeroxiBase database (http://peroxibase.isbsib.ch/) and more than 400 homologous proteins have been detected via PSI-BLAST search. Although few studies have characterized the function and structure of these proteins, they appear to be bifunctional enzymes with hydrolase or oxygenase, as well as typical peroxidase activities. DyP-type peroxidase family suggests an ancient root compared with other general peroxidases because of their widespread distribution in the living world. In this review, firstly, an outline of the characteristics of DyP from T. cucumeris is presented and then interesting characteristics of the DyP-type peroxidase family are discussed.

  8. Demethoxycurcumin is a potent inhibitor of P-type ATPases from diverse kingdoms of life

    DEFF Research Database (Denmark)

    Dao, Trong Tuan; Sehgal, Pankaj; Thanh Tung, Truong;

    2016-01-01

    the curcuminoids, demethoxycurcumin was the most potent inhibitor of all tested P-type ATPases from fungal (Pma1p; H+-ATPase), plant (AHA2; H+-ATPase) and animal (SERCA; Ca2+-ATPase) cells. All three curcuminoids acted as non-competitive antagonist to ATP and hence may bind to a highly conserved allosteric site......P-type ATPases catalyze the active transport of cations and phospholipids across biological membranes. Members of this large family are involved in a range of fundamental cellular processes. To date, a substantial number of P-type ATPase inhibitors have been characterized, some of which are used...... as drugs. In this work a library of natural compounds was screened and we first identified curcuminoids as plasma membrane H+-ATPases inhibitors in plant and fungal cells. We also found that some of the commercial curcumins contain several curcuminoids. Three of these were purified and, among...

  9. A simple model to estimate the optimal doping of p - Type oxide superconductors

    Directory of Open Access Journals (Sweden)

    Adir Moysés Luiz

    2008-12-01

    Full Text Available Oxygen doping of superconductors is discussed. Doping high-Tc superconductors with oxygen seems to be more efficient than other doping procedures. Using the assumption of double valence fluctuations, we present a simple model to estimate the optimal doping of p-type oxide superconductors. The experimental values of oxygen content for optimal doping of the most important p-type oxide superconductors can be accounted for adequately using this simple model. We expect that our simple model will encourage further experimental and theoretical researches in superconducting materials.

  10. Dual ohmic contact to N- and P-type silicon carbide

    Science.gov (United States)

    Okojie, Robert S. (Inventor)

    2013-01-01

    Simultaneous formation of electrical ohmic contacts to silicon carbide (SiC) semiconductor having donor and acceptor impurities (n- and p-type doping, respectively) is disclosed. The innovation provides for ohmic contacts formed on SiC layers having n- and p-doping at one process step during the fabrication of the semiconductor device. Further, the innovation provides a non-discriminatory, universal ohmic contact to both n- and p-type SiC, enhancing reliability of the specific contact resistivity when operated at temperatures in excess of 600.degree. C.

  11. High surface hole concentration p-type GaN using Mg implantation

    CERN Document Server

    Long Tao; Zhang Guo Yi

    2001-01-01

    Mg ions were implanted on Mg-doped GaN grown by metalorganic chemical vapor deposition (MOCVD). The p-type GaN was achieved with high hole concentration (8.28 x 10 sup 1 sup 7 cm sup - sup 3) conformed by Van derpauw Hall measurement after annealing at 800 degree C for 1 h. this is the first experimental report of Mg implantation on Mg-doped GaN and achieving p-type GaN with high surface hole concentration

  12. Hall and thermoelectric evaluation of p-type InAs

    Energy Technology Data Exchange (ETDEWEB)

    Wagener, M.C., E-mail: magnus.wagener@nmmu.ac.z [Department of Physics, Nelson Mandela Metropolitan University, Port Elizabeth (South Africa); Wagener, V.; Botha, J.R. [Department of Physics, Nelson Mandela Metropolitan University, Port Elizabeth (South Africa)

    2009-12-15

    This paper compares the galvanometric and thermoelectric evaluation of the electrical characteristics of narrow gap semiconductors. In particular, the influence of a surface inversion layer is incorporated into the analysis of the temperature-dependent Hall and thermoelectric measurements of p-type InAs. The temperature at which the Seebeck coefficient of p-type material changes sign is shown to be unaffected by the presence of degenerate conduction paths. This finding consequently facilitated the direct determination of the acceptor density of lightly doped thin film InAs.

  13. Silicon nitride equation of state

    Science.gov (United States)

    Brown, Robert C.; Swaminathan, Pazhayannur K.

    2017-01-01

    This report presents the development of a global, multi-phase equation of state (EOS) for the ceramic silicon nitride (Si3N4).1 Structural forms include amorphous silicon nitride normally used as a thin film and three crystalline polymorphs. Crystalline phases include hexagonal α-Si3N4, hexagonal β-Si3N4, and the cubic spinel c-Si3N4. Decomposition at about 1900 °C results in a liquid silicon phase and gas phase products such as molecular nitrogen, atomic nitrogen, and atomic silicon. The silicon nitride EOS was developed using EOSPro which is a new and extended version of the PANDA II code. Both codes are valuable tools and have been used successfully for a variety of material classes. Both PANDA II and EOSPro can generate a tabular EOS that can be used in conjunction with hydrocodes. The paper describes the development efforts for the component solid phases and presents results obtained using the EOSPro phase transition model to investigate the solid-solid phase transitions in relation to the available shock data that have indicated a complex and slow time dependent phase change to the c-Si3N4 phase. Furthermore, the EOSPro mixture model is used to develop a model for the decomposition products; however, the need for a kinetic approach is suggested to combine with the single component solid models to simulate and further investigate the global phase coexistences.

  14. Nucleation of iron nitrides during gaseous nitriding of iron; the effect of a preoxidation treatment

    DEFF Research Database (Denmark)

    Friehling, Peter B.; Poulsen, Finn Willy; Somers, Marcel A.J.

    2001-01-01

    grains. On prolonged nitriding, immediate nucleation at the surface of iron grains becomes possible. Calculated incubation times for the nucleation of gamma'-Fe4N1-x during nitriding are generally longer than those observed experimentally in the present work. The incubation time is reduced dramatically......The nucleation of iron nitrides during gaseous nitriding has been investigated using light microscopy and X-ray diffraction. Initially, the nucleation of gamma'-Fe4N1-x on a pure iron surface starts at grain boundaries meeting the surface, from where the nitride grains grow laterally into the iron...

  15. Advanced Middle-UV Coherent Optical Sources

    Science.gov (United States)

    2013-11-15

    Achievements: RBS measurements performed on InAlN layers determined the existence of unwanted gallium atoms ( contaminants ). We found that gallium was...doping. Specifically, the high activation energy of Mg acceptors in wide-bandgap III- Nitride alloys places constraints on the electrical...effects of inefficient p-type doping of wide bandgap III- Nitride ternary material is the emergence of an unintentional “hole blocking layer” between the

  16. Electronic transitions in the bandgap of copper indium gallium diselenide polycrystalline thin films

    Science.gov (United States)

    Heath, Jennifer Theresa

    The electronic properties of polycrystalline copper indium gallium diselenide thin films have been investigated, with emphasis on understanding the distribution and origin of electronic states in the bandgap. The samples studied were working photovoltaic devices with the structure ZnO/CdS/CuIn1-xGa xSe2/Mo, and photovoltaic efficiencies ranging from 8 to 16%. The CdS layer and the p-type CuIn1-xGa xSe2 film create the n+- p junction at the heart of these devices. The samples were investigated using four techniques based on the electrical response of the junction: admittance spectroscopy, drive level capacitance profiling, transient photocapacitance spectroscopy, and transient photocurrent spectroscopy. From these measurements the free carrier densities, defect densities within the bandgap, spatial uniformity, and minority carrier mobilities have been deduced. The sub-bandgap response from the CuIn1-xGaxSe2 film was dominated by two defects. One exhibited a thermal transition to the valence band with an activation energy ranging between 0.1 and 0.3 eV and thermal emission prefactors obeying the Meyer-Neldel rule. The second was detected as an optical transition 0.8 eV from the valence band edge. Neither of these defects exhibited densities that varied systematically with gallium content, implying that they are not directly connected with the group III elements in these alloys. The defect densities also do not clearly correlate with the photovoltaic device performance; however, the position of the 0.8 eV defect lies nearer to mid-gap in the higher gallium, and hence higher band gap, material. This implies that it may be a more important recombination center in these devices and may be partially responsible for the reduced photovoltaic efficiencies observed when Ga/(In + Ga) > 0.4. An additional defect response was observed near mid-gap in films grown by processes known to produce lower quality devices. The influence of defects located at grain boundaries was also

  17. Role of Gallium and labeled leukocyte scintigraphy in AIDS patient

    Energy Technology Data Exchange (ETDEWEB)

    Palestro, C.J. [Division of nuclear medicine, Long Island Jewish Medical Center, New Hyde Park, New York (United States); Goldsmith, S.J. [Division of nuclear medicine, New York Hospital, Cornell Medical Center, New York (United States)

    1995-09-01

    Because AIDS patients frequently present with minimal symptomatology, radionuclide imaging with its ability to survey the entire body, is especially valuable. Gallium-67 citrate, the most commonly performed radionuclide study for localizing infection in these patients, is most useful for detecting opportunistic infections, especially in the thorax. A negative gallium scan, particularly when the chest X-ray is unremarkable, rules strongly against pulmonary disease. A negative gallium scan in a patient with an abnormal chest X-ray and Kaposi`s sarcoma, suggests that the patient`s respiratory distress is related to the neoplasm. Diffuse pulmonary parenchymal uptake of gallium in the HIV (+) patient is most often associated with PCP. While there are other causes of diffuse pulmonary uptake, the more intense or heterogeneous the uptake, the more likely the patient is to have PCP. Focal pulmonary uptake is usually associated with bacterial pneumonia although PCP may occasionally present in this fashion. Lymph node uptake of gallium is usually associated with Mycob acterium avium complex, tuberculosis, or Iymphoma. When corresponding abnormalities are present on thallium scintigraphy lymphoma is likely. Gallium positive, thallium negative, studies suggest mycobacterial disease. Labeled leukocyte imaging is not useful for detecting opportunistic infections probably because of the inflammatory response incited by these organisms. Leukocyte imaging is, however, more sensitive for detecting bacterial pneumonia. In the abdomen, gallium imaging is most useful for identifying lymphadenopathy, while labeled leukocyte imaging is superior for detecting AlDS-associated colitides. In summary, radionuclide studies are valuable diagnostic modalities in AIDS. Their success can be maximized by tailoring the study to the individual`s needs.

  18. Application of ultrasound in solvent extraction of nickel and gallium

    Energy Technology Data Exchange (ETDEWEB)

    Pesic, B.

    1996-07-01

    The effects of ultrasound on the rate of solvent extraction of nickel with Lix 65N and Lix 70, and gallium with Kelex 100 were investigated. These solvent extraction systems are noted by their sluggish nature. Low frequency (20 kHz) ultrasound increased the rates of extraction of nickel by factors of four to seven. The ultrasound had no effect on the final chemical equilibrium. Gallium extraction rates were enhanced with the use of ultrasound by as much as a factor of 15. Again, the ultrasound had no effect on extraction equilibrium. For both nickel and gallium, the enhanced rates were attributed to increased interfacial surface area associated with ultrasonically induced cavitation and microdroplet formation. The stability of the microdroplets permitted intermittent application of ultrasound with corresponding decreases in ultrasonic energy requirements. The lowest energy consumption was observed with short (0.25 to 5 s) bursts of high power (41 to 61 W) ultrasonic inputs. The study also provided insight into the factors that affect the complex extraction of gallium from sodium aluminate solutions. The rate controlling step was found to be the dehydration of the gallate ion, Ga(OH)4, and the first complex formation between gallium and Kelex 100. Sodium was found to enhance the extraction rate up to a point, beyond which increased concentration was detrimental. Increasing aluminum concentration was found to slow extraction rates. Modifiers and diluents were shown to markedly affect extraction rates even without ultrasound. Ketone modifiers, particularly 2-undecanone, when used with Kermac 470B or Escaid 200 diluents enhanced extraction rates of gallium to the point that the use of ultrasound provided no additional benefits. The positive effects of ketone modifiers for the solvent extraction of gallium had not been previously reported.

  19. Realization of Ag-S codoped p-type ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Xu, Tian Ning, E-mail: xtn9886@zju.edu.cn [Department of Science, Zhijiang College of Zhejiang University of Technology, Hangzhou, Zhejiang 310024 (China); Department of Physics, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou, Zhejiang 310027 (China); Li, Xiang; Lu, Zhong [Department of Science, Zhijiang College of Zhejiang University of Technology, Hangzhou, Zhejiang 310024 (China); Chen, Yong Yue [Department of Physics, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou, Zhejiang 310027 (China); Sui, Cheng Hua [Department of Science, Zhijiang College of Zhejiang University of Technology, Hangzhou, Zhejiang 310024 (China); Wu, Hui Zhen [Department of Physics, State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou, Zhejiang 310027 (China)

    2014-10-15

    Highlights: • Ag-S codoped p-type ZnO thin films have been fabricated. • The films exhibit low resistivity and high Hall mobility and hole concentration. • A ZnO:(Ag, S)/i-ZnO/ZnO:Al homojunction has been fabricated and shows rectifying behaviors. - Abstract: Ag-S codoped ZnO films have been grown on quartz substrates by e-beam evaporation at low temperature (100 °C). The effects of Ag{sub 2}S content on the structural and electrical properties of the films were investigated. The results showed that 2 wt% Ag{sub 2}S doped films exhibited p-type conduction, with a resistivity of 0.0347 Ω cm, a Hall mobility of 9.53 cm{sup 2} V{sup −1} s{sup −1}, and a hole concentration of 1.89 × 10{sup 19} cm{sup −3} at room temperature. The X-ray photoelectron spectroscopy measurements showed that Ag and S have been incorporated into the films. To further confirm the p-type conduction of Ag-S codoped ZnO films, a ZnO:(Ag, S)/i-ZnO/ZnO:Al homojunction was fabricated and rectifying behaviors of which was measured. High electrical performance and low growth temperature indicate that Ag{sub 2}S is a promising dopant to fabricate p-type Ag-S codoped ZnO films.

  20. Relative Frequencies of G and P Types among Rotaviruses from Indian Diarrheic Cow and Buffalo Calves

    Science.gov (United States)

    Gulati, Baldev R.; Nakagomi, Osamu; Koshimura, Yumi; Nakagomi, Toyoko; Pandey, Ramayan

    1999-01-01

    While an increasing number of studies suggest that there is a high prevalence of rotaviruses with P8[11], a typical P type of bovine rotavirus (BRV), among human neonates or infants in India, no data are available on the distribution of G and P types of Indian BRVs. Thus, fecal specimens were collected from cow and buffalo calves under 1 month of age on organized dairy farms in India during the period between 1994 and 1997, and 36 rotavirus-positive specimens were used to determine the relative frequencies of the G and P types of Indian BRVs. As to the G type, G10 was predominant (83%), followed by G6 (6%). The majority (94%) of BRVs had P8[11], and only one isolate possessed P6[1]. The most common combination of G and P types was G10P8[11] (81%), followed by G6P6[1] (3%) and G6P8[11] (3%). The high prevalence of BRVs possessing P8[11] VP4s strongly supports the hypothesis that BRVs may cross the host species barrier and circulate among neonates in India. PMID:10325385

  1. Characterization of 3D-DDTC detectors on p-type substrates

    CERN Document Server

    Betta, G -F Dalla; Bosisio, Luciano; Darbo, Giovanni; Gabos, Paolo; Gemme, Claudia; Koehler, Michael; La Rosa, Alessandro; Parzefall, Ulrich; Pernegger, Heinz; Piemonte, Claudio; Povoli, Marco; Rachevskaia, Irina; Ronchin, Sabina; Wiik, Liv; Zoboli, Aanrea; Zorzi, Nicola

    2009-01-01

    We report on the electrical and functional characterization of 3D Double-side, Double-Type-Column (3D- DDTC) detectors fabricated on p-type substrates. Results relevant to detectors in the diode, strip and pixel configurations are presented, and demonstrate a clear improvement in the charge collection performance compared to the first prototypes of these detectors.

  2. Origin and evolution of metal p-Type ATPases in Plantae (Archaeplastida

    Directory of Open Access Journals (Sweden)

    Marc eHanikenne

    2014-01-01

    Full Text Available Metal ATPases are a subfamily of P-type ATPases involved in the transport of metal cations across biological membranes. They all share an architecture featuring eight transmembrane domains in pairs of two and are found in prokaryotes as well as in a variety of Eukaryotes. In Arabidopsis thaliana, eight metal P-type ATPases have been described, four being specific to copper transport and four displaying a broader metal specificity, including zinc, cadmium and possibly copper and calcium. So far, few efforts have been devoted to elucidating the origin and evolution of these proteins in Eukaryotes. In this work, we use large-scale phylogenetics to show that metal P-type ATPases form a homogenous group among P-type ATPases and that their specialisation into either monovalent (Cu or divalent (Zn, Cd… metal transport stems from a gene duplication that took place early in the evolution of Life. Then, we demonstrate that the four subgroups of plant metal ATPases all have a different evolutionary origin and a specific taxonomic distribution, only one tracing back to the cyanobacterial progenitor of the chloroplast. Finally, we examine the subsequent evolution of these proteins in green plants and conclude that the genes thoroughly characterised in model organisms are often the result of lineage-specific gene duplications, which calls for caution when attempting to infer function from sequence similarity alone in non-model organisms.

  3. Synthesis of p-type and n-type nickel ferrites and associated electrical properties

    Energy Technology Data Exchange (ETDEWEB)

    Šutka, Andris, E-mail: andris.sutka@rtu.lv [Faculty of Material Science and Applied Chemistry, Riga Technical University, Paula Valdena 3, Riga, LV-1048 (Latvia); Institute of Physics, University of Tartu, Ravila 14c, 50411, 51014 Tartu (Estonia); Pärna, Rainer [Institute of Physics, University of Tartu, Ravila 14c, 50411, 51014 Tartu (Estonia); Estonian Nanotechnology Competence Centre, Ravila 14c, 50411, 51014 Tartu (Estonia); Käämbre, Tanel [Institute of Physics, University of Tartu, Ravila 14c, 50411, 51014 Tartu (Estonia); Kisand, Vambola [Institute of Physics, University of Tartu, Ravila 14c, 50411, 51014 Tartu (Estonia); Estonian Nanotechnology Competence Centre, Ravila 14c, 50411, 51014 Tartu (Estonia)

    2015-01-01

    We used sol–gel auto combustion to synthesize nickel ferrites of p-type and n-type conductivity by controlling the relative amounts of nickel and iron during synthesis. The obtained samples have been characterized by XRD, FE-SEM, electrical measurements and XPS. We observe huge differences in the effect of grain size on the electrical resistivity between the p-type and the n-type material when the grain size increases from nano to micro scale during annealing at temperatures from 900 {sup o}C to 1300 {sup o}C. The observed resistivity decrease (due to grain size) is four orders of magnitude in the n-type nickel ferrite, whereas the p-type material remains virtually unaffected. We rationalize this drastic difference to stem from a reverse contrast of the surface (grain shell) versus bulk (grain core) conductivity between p- and n-type ferrite. With the grain shells in p-type the easier charge carrier path the effect of scatter at grain boundaries is accordingly diminished, whereas in the n-type charge transport properties are controlled by (the number of) grain boundaries in a conduction path.

  4. A structural and functional perspective of DyP-type peroxidase family.

    Science.gov (United States)

    Yoshida, Toru; Sugano, Yasushi

    2015-05-15

    Dye-decolorizing peroxidase from the basidiomycete Bjerkandera adusta Dec 1 (DyP) is a heme peroxidase. This name reflects its ability to degrade several anthraquinone dyes. The substrate specificity, the amino acid sequence, and the tertiary structure of DyP are different from those of the other heme peroxidase (super)families. Therefore, many proteins showing the similar amino acid sequences to that of DyP are called DyP-type peroxidase which is a new family of heme peroxidase identified in 2007. In fact, all structures of this family show a similar structure fold. However, this family includes many proteins whose amino acid sequence identity to DyP is lower than 15% and/or whose catalytic efficiency (kcat/Km) is a few orders of magnitude less than that of DyP. A protein showing an activity different from peroxidase activity (dechelatase activity) has been also reported. In addition, the precise physiological roles of DyP-type peroxidases are unknown. These facts raise a question of whether calling this family DyP-type peroxidase is suitable. Here, we review the differences and similarities of structure and function among this family and propose the reasonable new classification of DyP-type peroxidase family, that is, class P, I and V. In this contribution, we discuss the adequacy of this family name.

  5. Gallium a unique anti-resorptive agent in bone: Preclinical studies on its mechanisms of action

    Energy Technology Data Exchange (ETDEWEB)

    Bockman, R.; Adelman, R.; Donnelly, R.; Brody, L.; Warrell, R. (Hospital for Special Surgery, New York, NY (USA)); Jones, K.W. (Brookhaven National Lab., Upton, NY (USA))

    1990-01-01

    The discovery of gallium as a new and unique agent for the treatment of metabolic bone disorders was in part fortuitous. Gallium is an exciting new therapeutic agent for the treatment of pathologic states characterized by accelerated bone resorption. Compared to other therapeutic metal compounds containing platinum or germanium, gallium affects its antiresorptive action without any evidence of a cytotoxic effect on bone cells. Gallium is unique amongst all therapeutically available antiresorptive agents in that it favors bone formation. 18 refs., 1 fig.

  6. III-nitrides, 2D transition metal dichalcogenides, and their heterojunctions

    KAUST Repository

    Mishra, Pawan

    2017-04-01

    Group III-nitride materials have attracted great attention for applications in high efficiency electronic and optoelectronics devices such as high electron mobility transistors, light emitting diodes, and laser diodes. On the other hand, group VI transition metal dichalcogenides (TMDs) in the form of MX2 has recently emerged as a novel atomic layered material system with excellent thermoelectric, electronic and optoelectronic properties. Also, the recent investigations reveal that the dissimilar heterojunctions formed by TMDs and III-nitrides provide the route for novel devices in the area of optoelectronic, electronics, and water splitting applications. In addition, integration of III-nitrides and TMDs will enable high density integrated optoelectronic circuits and the development of hybrid integration technologies. In this work, we have demonstrated kinetically controlled growth processes in plasma assisted molecular beam epitaxy (PAMBE) for the III-nitrides and their engineered heterostructures. Techniques such as Ga irradiation and nitrogen plasma exposure has been utilized to implement bulk GaN, InGaN and their heterostructures in PAMBE. For the growth of III-nitride based heterostructures, the in-situ surface stoichiometry monitoring (i-SSM) technique was developed and used for implementing stepped and compositionally graded InGaN-based multiple quantum wells (MQWs). Their optical and microstrain analysis in conjunction with theoretical studies confirmed improvement in the radiative recombination rate of the graded-MQWs as compared to that of stepped-MQWs, owing to the reduced strain in graded-MQWs. Our achievement also includes the realization of the p-type MoS2 by engineering pristine MoS2 layers in PAMBE. Mainly, Ga and nitrogen plasma irradiation on the pristine MoS2 in PAMBE has resulted in the realization of the p-type MoS2. Also, GaN epitaxial thin layers were deposited on MoS2/c-sapphire, WSe2/c-sapphire substrates by PAMBE to study the band

  7. Gallium based low-interaction anions

    Science.gov (United States)

    King, Wayne A.; Kubas, Gregory J.

    2000-01-01

    The present invention provides: a composition of the formula M.sup.+x (Ga(Y).sub.4.sup.-).sub.x where M is a metal selected from the group consisting of lithium, sodium, potassium, cesium, calcium, strontium, thallium, and silver, x is an integer selected from the group consisting of 1 or 2, each Y is a ligand selected from the group consisting of aryl, alkyl, hydride and halide with the proviso that at least one Y is a ligand selected from the group consisting of aryl, alkyl and halide; a composition of the formula (R).sub.x Q.sup.+ Ga(Y).sub.4.sup.- where Q is selected from the group consisting of carbon, nitrogen, sulfur, phosphorus and oxygen, each R is a ligand selected from the group consisting of alkyl, aryl, and hydrogen, x is an integer selected from the group consisting of 3 and 4 depending upon Q, and each Y is a ligand selected from the group consisting of aryl, alkyl, hydride and halide with the proviso that at least one Y is a ligand selected from the group consisting of aryl, alkyl and halide; an ionic polymerization catalyst composition including an active cationic portion and a gallium based weakly coordinating anion; and bridged anion species of the formula M.sup.+x.sub.y [X(Ga(Y.sub.3).sub.z ].sup.-y.sub.x where M is a metal selected from the group consisting of lithium, sodium, potassium, magnesium, cesium, calcium, strontium, thallium, and silver, x is an integer selected from the group consisting of 1 or 2, X is a bridging group between two gallium atoms, y is an integer selected from the group consisting 1 and 2, z is an integer of at least 2, each Y is a ligand selected from the group consisting of aryl, alkyl, hydride and halide with the proviso that at least one Y is a ligand selected from the group consisting of aryl, alkyl and halide.

  8. Low temperature anodic bonding to silicon nitride

    DEFF Research Database (Denmark)

    Weichel, Steen; Reus, Roger De; Bouaidat, Salim;

    2000-01-01

    Low-temperature anodic bonding to stoichiometric silicon nitride surfaces has been performed in the temperature range from 3508C to 4008C. It is shown that the bonding is improved considerably if the nitride surfaces are either oxidized or exposed to an oxygen plasma prior to the bonding. Both bulk...

  9. Composite Reinforcement using Boron Nitride Nanotubes

    Science.gov (United States)

    2016-11-15

    ApprovedOMB No. 0704-0188 The public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for...nitride nanotubes change with the presence of atomic oxygen were also carried out. 15.  SUBJECT TERMS Nanotubes, Boron Nitride, Composites, Theoretical

  10. PECVD silicon nitride diaphragms for condenser microphones

    NARCIS (Netherlands)

    Scheeper, P.R.; Voorthuyzen, J.A.; Bergveld, P.

    1991-01-01

    The application of plasma-enhanced chemical vapour deposited (PECVD) silicon nitride as a diaphragm material for condenser microphones has been investigated. By means of adjusting the SiH4/NH3 gas-flow composition, silicon-rich silicon nitride films have been obtained with a relatively low tensile s

  11. Method of preparation of uranium nitride

    Science.gov (United States)

    Kiplinger, Jaqueline Loetsch; Thomson, Robert Kenneth James

    2013-07-09

    Method for producing terminal uranium nitride complexes comprising providing a suitable starting material comprising uranium; oxidizing the starting material with a suitable oxidant to produce one or more uranium(IV)-azide complexes; and, sufficiently irradiating the uranium(IV)-azide complexes to produce the terminal uranium nitride complexes.

  12. Thermodynamics, kinetics and process control of nitriding

    DEFF Research Database (Denmark)

    Mittemeijer, Eric J.; Somers, Marcel A. J.

    1999-01-01

    , the nitriding result is determined largely by the kinetics of the process. The nitriding kinetics have been shown to be characterised by the occurring local near-equilibria and stationary states at surfaces and interfaces, and the diffusion coefficient of nitrogen in the various phases, for which new data have...

  13. Gallium nitrate inhibits alkaline phosphatase activity in a differentiating mesenchymal cell culture.

    Science.gov (United States)

    Boskey, A L; Ziecheck, W; Guidon, P; Doty, S B

    1993-02-01

    The effect of gallium nitrate on alkaline phosphatase activity in a differentiating chick limb-bud mesenchymal cell culture was monitored in order to gain insight into the observation that rachitic rats treated with gallium nitrate failed to show the expected increase in serum alkaline phosphatase activity. Cultures maintained in media containing 15 microM gallium nitrate showed drastically decreased alkaline phosphatase activities in the absence of significant alterations in total protein synthesis and DNA content. However, addition of 15 microM gallium nitrate to cultures 18 h before assay for alkaline phosphatase activity had little effect. At the light microscopic and electron microscopic level, gallium-treated cultures differed morphologically from gallium-free cultures: with gallium present, there were fewer hypertrophic chondrocytes and cartilage nodules were flatter and further apart. Because of altered morphology, staining with an antibody against chick cartilage alkaline phosphatase appeared less extensive; however, all nodules stained equivalently relative to gallium-free controls. Histochemical staining for alkaline phosphatase activity was negative in gallium-treated cultures, demonstrating that the alkaline phosphatase protein present was not active. The defective alkaline phosphatase activity in cultures maintained in the presence of gallium was also evidenced when cultures were supplemented with the alkaline phosphatase substrate, beta-glycerophosphate (beta GP). The data presented suggest that gallium inhibits alkaline phosphatase activity in this culture system and that gallium causes alterations in the differentiation of mesenchymal cells into hypertrophic chondrocytes.

  14. Gallium scintigraphy in a case of septic cavernous sinus thrombosis

    Energy Technology Data Exchange (ETDEWEB)

    Palestro, C.J.; Malat, J.; Gladstone, A.G.; Richman, A.H.

    1986-09-01

    Septic cavernous sinus thrombosis, a relatively uncommon disease entity, frequently can be fatal. Early diagnosis is imperative in order that appropriate treatment be instituted. A 59-year-old woman who was admitted to our institution with complaints of diplopia, blurred vision and fevers that developed following a tooth extraction is presented. Initial CT and lumbar puncture on the day of admission were totally normal. A repeat CT performed 48 hours after admission, on the same day as gallium imaging, demonstrated findings consistent with cavernous sinus thrombosis. Gallium imaging demonstrated intense uptake in the left cavernous sinus and left orbit as well as moderately increased activity in the right cavernous sinus and orbit, confirming infection. The patient was treated with antibiotics, and repeat CT and gallium imaging were performed ten days later, both of which demonstrated near total resolution of the disease process. Conceivably, if gallium imaging had been initiated on the day of admission it may have been the first study to demonstrate an infectious process in the cavernous sinus. Gallium imaging should be considered as a diagnostic tool in the noninvasive workup of this entity.

  15. One-pot electrodeposition, characterization and photoactivity of stoichiometric copper indium gallium diselenide (CIGS) thin films for solar cells.

    Science.gov (United States)

    Harati, Mohammad; Jia, Jia; Giffard, Kévin; Pellarin, Kyle; Hewson, Carly; Love, David A; Lau, Woon Ming; Ding, Zhifeng

    2010-12-14

    Herein we report the one-pot electrodeposition of copper indium gallium diselenide, CuIn(1-x)Ga(x)Se(2) (CIGS), thin films as the p-type semiconductor in an ionic liquid medium consisting of choline chloride/urea eutectic mixture known as Reline. The thin films were characterized by scanning electron microscopy with energy dispersive X-ray analysis, transmission electron microscopy, X-ray photoelectron spectroscopy, Raman microspectroscopy, and UV-visible spectroscopy. Based on the results of the characterizations, the electrochemical bath recipe was optimized to obtain stoichiometric CIGS films with x between 0.2 and 0.4. The chemical activity and photoreactivity of the optimized CIGS films were found to be uniform using scanning electrochemical microscopy and scanning photoelectrochemical microscopy. Low-cost stoichiometric CIGS thin films in one-pot were successfully fabricated.

  16. Cathodic Cage Plasma Nitriding: An Innovative Technique

    Directory of Open Access Journals (Sweden)

    R. R. M. de Sousa

    2012-01-01

    Full Text Available Cylindrical samples of AISI 1020, AISI 316, and AISI 420 steels, with different heights, were simultaneously treated by a new technique of ionic nitriding, entitled cathodic cage plasma nitriding (CCPN, in order to evaluate the efficiency of this technique to produce nitrided layers with better properties compared with those obtained using conventional ionic nitriding technique. This method is able to eliminate the edge effect in the samples, promoting a better uniformity of temperature, and consequently, a smaller variation of the thickness/height relation can be obtained. The compound layers were characterized by X-ray diffraction, optical microscopy, and microhardness test profile. The results were compared with the properties of samples obtained with the conventional nitriding, for the three steel types. It was verified that samples treated by CCPN process presented, at the same temperature, a better uniformity in the thickness and absence of the edge effect.

  17. Hard carbon nitride and method for preparing same

    Science.gov (United States)

    Haller, E.E.; Cohen, M.L.; Hansen, W.L.

    1992-05-05

    Novel crystalline [alpha](silicon nitride-like)-carbon nitride and [beta](silicon nitride-like)-carbon nitride are formed by sputtering carbon in the presence of a nitrogen atmosphere onto a single crystal germanium or silicon, respectively, substrate. 1 figure.

  18. Molten-Salt-Based Growth of Group III Nitrides

    Science.gov (United States)

    Waldrip, Karen E.; Tsao, Jeffrey Y.; Kerley, Thomas M.

    2008-10-14

    A method for growing Group III nitride materials using a molten halide salt as a solvent to solubilize the Group-III ions and nitride ions that react to form the Group III nitride material. The concentration of at least one of the nitride ion or Group III cation is determined by electrochemical generation of the ions.

  19. Investigation on gallium ions impacting monolayer graphene

    Directory of Open Access Journals (Sweden)

    Xin Wu

    2015-06-01

    Full Text Available In this paper, the physical phenomena of gallium (Ga+ ion impacting monolayer graphene in the nanosculpting process are investigated experimentally, and the mechanisms are explained by using Monte Carlo (MC and molecular dynamics (MD simulations. Firstly, the MC method is employed to clarify the phenomena happened to the monolayer graphene target under Ga+ ion irradiation. It is found that substrate has strong influence on the damage mode of graphene. The mean sputtering yield of graphene under 30 keV Ga+ ion irradiation is 1.77 and the least ion dose to completely remove carbon atoms in graphene is 21.6 ion/nm2. Afterwards, the focused ion beam over 21.6 ion/nm2 is used for the irradiation on a monolayer graphene supported by SiO2 experimentally, resulting in the nanostructures, i.e., nanodot and nanowire array on the graphene. The performances of the nanostructures are characterized by atomic force microscopy and Raman spectrum. A plasma plume shielding model is put forward to explain the nanosculpting results of graphene under different irradiation parameters. In addition, two damage mechanisms are found existing in the fabrication process of the nanostructures by using empirical MD simulations. The results can help us open the possibilities for better control of nanocarbon devices.

  20. Investigation on gallium ions impacting monolayer graphene

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Xin; Zhao, Haiyan, E-mail: hyzhao@tsinghua.edu.cn; Yan, Dong; Pei, Jiayun [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, P. R. Chinaand Department of Mechanical Engineering, Tsinghua University, Beijing 100084 (China)

    2015-06-15

    In this paper, the physical phenomena of gallium (Ga{sup +}) ion impacting monolayer graphene in the nanosculpting process are investigated experimentally, and the mechanisms are explained by using Monte Carlo (MC) and molecular dynamics (MD) simulations. Firstly, the MC method is employed to clarify the phenomena happened to the monolayer graphene target under Ga{sup +} ion irradiation. It is found that substrate has strong influence on the damage mode of graphene. The mean sputtering yield of graphene under 30 keV Ga{sup +} ion irradiation is 1.77 and the least ion dose to completely remove carbon atoms in graphene is 21.6 ion/nm{sup 2}. Afterwards, the focused ion beam over 21.6 ion/nm{sup 2} is used for the irradiation on a monolayer graphene supported by SiO2 experimentally, resulting in the nanostructures, i.e., nanodot and nanowire array on the graphene. The performances of the nanostructures are characterized by atomic force microscopy and Raman spectrum. A plasma plume shielding model is put forward to explain the nanosculpting results of graphene under different irradiation parameters. In addition, two damage mechanisms are found existing in the fabrication process of the nanostructures by using empirical MD simulations. The results can help us open the possibilities for better control of nanocarbon devices.

  1. Aluminum Nitride Micro-Channels Grown via Metal Organic Vapor Phase Epitaxy for MEMs Applications

    Energy Technology Data Exchange (ETDEWEB)

    Rodak, L.E.; Kuchibhatla, S.; Famouri, P.; Ting, L.; Korakakis, D.

    2008-01-01

    Aluminum nitride (AlN) is a promising material for a number of applications due to its temperature and chemical stability. Furthermore, AlN maintains its piezoelectric properties at higher temperatures than more commonly used materials, such as Lead Zirconate Titanate (PZT) [1, 2], making AlN attractive for high temperature micro and nanoelectromechanical (MEMs and NEMs) applications including, but not limited to, high temperature sensors and actuators, micro-channels for fuel cell applications, and micromechanical resonators. This work presents a novel AlN micro-channel fabrication technique using Metal Organic Vapor Phase Epitaxy (MOVPE). AlN easily nucleates on dielectric surfaces due to the large sticking coefficient and short diffusion length of the aluminum species resulting in a high quality polycrystalline growth on typical mask materials, such as silicon dioxide and silicon nitride [3,4]. The fabrication process introduced involves partially masking a substrate with a silicon dioxide striped pattern and then growing AlN via MOVPE simultaneously on the dielectric mask and exposed substrate. A buffered oxide etch is then used to remove the underlying silicon dioxide and leave a free standing AlN micro-channel. The width of the channel has been varied from 5 ìm to 110 ìm and the height of the air gap from 130 nm to 800 nm indicating the stability of the structure. Furthermore, this versatile process has been performed on (111) silicon, c-plane sapphire, and gallium nitride epilayers on sapphire substrates. Reflection High Energy Electron Diffraction (RHEED), Atomic Force Microscopy (AFM), and Raman measurements have been taken on channels grown on each substrate and indicate that the substrate is influencing the growth of the AlN micro-channels on the SiO2 sacrificial layer.

  2. Antibacterial effect of gallium and silver on Pseudomonas aeruginosa treated with gallium-silver-phosphate-based glasses.

    Science.gov (United States)

    Valappil, Sabeel P; Higham, Susan M

    2014-01-01

    Gallium and silver incorporated phosphate-based glasses were evaluated for antibacterial effect on the growth of Pseudomonas aeruginosa, which is a leading cause of opportunistic infections. The glasses were produced by conventional melt quenching methods at 1100°C for 1 h. Glass degradation studies were conducted by weight loss method. Disc diffusion assay and cell viability assay displayed statistically significant (p ≤ 0.0005) effect on P. aeruginosa growth which increased with decreasing calcium content in the glasses. The gallium ion release rates (1.83, 0.69 and 0.48 ppm·h(-1)) and silver ion release rates (2.97, 2.84 and 2.47 ppm·h(-1)) were found to account for this variation. Constant depth film fermentor was used to evaluate the anti-biofilm properties of the glasses. Both gallium and silver in the glass contributed to biofilm growth inhibitory effect on P. aeruginosa (up to 2.68 reduction in log 10 values of the viable counts compared with controls). The glasses were found to deliver gallium and silver in a controlled way and exerted cumulative antibacterial action on planktonic and biofilm growth of P. aeruginosa. The antibacterial, especially anti-biofilm, properties of the gallium and silver incorporated phosphate-based glasses make them a potential candidate to combat infections caused by P. aeruginosa.

  3. Spectrofluorimetric determination of gallium with calon-carboxylic acid

    Institute of Scientific and Technical Information of China (English)

    2003-01-01

    A simple and sensitive spectrofluorimetric procedure for the analysis of microquantities of gallium in alloy wasdescribed. The method is based on the formation of Ga(Ⅲ)-CCA (calon-carboxylic acid) complex. The emission of thefluorescent complex was measured at λ = 620 nm with excitation at λ = 584 nm. A good linearity was found in the galliumrange of 0.7-280 ng/mL. The precision of the method is good and the relative standard deviation is 1.9% for a gallium stan-dard solution of 70 ng/mL. The procedure was proved to be suitable in terms of accuracy and selectivity for the mi-croamount of gallium in alloy.

  4. Photoconductive Properties of Brush Plated Copper Indium Gallium Selenide Films

    Directory of Open Access Journals (Sweden)

    N. P. Subiramaniyam

    2013-01-01

    Full Text Available Copper indium gallium selenide (CIGS films were deposited for the first time by the brush electrodeposition technique. X-ray diffraction studies indicated the formation of single phase chalcopyrite CIGS. Lattice parameters, dislocation density, and strain were calculated. Band gap of the films increased from 1.12 eV to 1.63 eV as the gallium concentration increased. Room temperature transport parameters of the films, namely, resistivity increased from 0.10 ohm cm to 12 ohm cm, mobility decreased from 125 cm2V−1s−1 to 20.9 cm2V−1s−1, and carrier concentration decreased from 4.99 × 1017 cm−3 to 2.49 × 1016 cm−3 as the gallium concentration increased. Photosensitivity of the films increased linearly with intensity of illumination and with increase of applied voltage.

  5. Gallium scintigraphy in Hansen's disease

    Energy Technology Data Exchange (ETDEWEB)

    Braga, F.J.H.N. (Hopital Henri-Mondor, 75 - Paris (France). Service de Biophysique de Medecine Nucleaire Sao Paulo Univ., SP (Brazil). Centro de Medicina Nuclear); Araejo, E.B.; Camargo, E.E. (Sao Paulo Univ., SP (Brazil). Centro de Medicina Nuclear); Tedesco-Marchesi, L.C.M.; Rivitti, M.C.M. (Sao Paulo Univ., SP (Brazil). Servicio de Dermatologia); Bouladour, H.; Galle, P. (Hopital Henri-Mondor, 75 - Paris (France). Service de Biophysique de Medecine Nucleaire)

    1991-11-01

    Gallium 67 imaging was used in 12 patients with documented Hansen's disease undergoing treatment or not in an attempt to determine the pattern of the disease. Diagnosis was confirmed by histopathology in all patients. The Mitsuda reaction was seen in all patients. Specific nuclear studies were performed when needed to evaluate particular organs better. Gallium 67 images show homogeneous, diffuse and moderate accumulation over the entire skin surface (except for the face) of untreated patients with multibacillary disease. The face skin in these cases presented homogeneous, diffuse but very marked uptake of gallium. Internal organ involvement was variable. There was a very good correlation among clinical, scintigraphical, immunological and histopathological data. The pattern of the body skin ('skin outlining') and face skin ('beard distribution') may be distinct for untreated patients with multibacillary leprosy. (orig.).

  6. Infrared absorption and visible transparency in heavily doped p-type BaSnO3

    Science.gov (United States)

    Li, Yuwei; Sun, Jifeng; Singh, David J.

    2017-01-01

    The recent experimental work shows that perovskite BaSnO3 can be heavily doped by K to become a stable p-type semiconductor. Here, we find that p-type perovskite BaSnO3 retains transparency for visible light while absorbing strongly in the infrared below 1.5 eV. The origin of the remarkable optical transparency even with heavy doping is that the interband transitions that are enabled by empty states at the top of the valence band are concentrated mainly in the energy range from 0.5 to 1.5 eV, i.e., not extending past the near IR. In contrast to n-type, the Burstein-Moss shift is slightly negative, but very small reflecting the heavier valence bands relative to the conduction bands.

  7. CCE measurements and annealing studies on proton-irradiated p-type MCz silicon diodes

    CERN Document Server

    Hoedlmoser, H; Köhler, M; Nordlund, H

    2007-01-01

    Magnetic Czochralski (MCz) silicon has recently been investigated for the development of radiation tolerant detectors for future high-luminosity HEP experiments. A study of p-type MCz Silicon diodes irradiated with protons up to a fluence of has been performed by means of Charge Collection Efficiency (CCE) measurements as well as standard CV/IV characterizations. The changes of CCE, full depletion voltage and leakage current as a function of fluence are reported. A subsequent annealing study of the irradiated detectors shows an increase in effective doping concentration and a decrease in the leakage current, whereas the CCE remains basically unchanged. Two different series of detectors have been compared differing in the implantation dose of p-spray isolation as well as effective doping concentration (Neff) of the p-type bulk presumably due to a difference in thermal donor (TD) activation during processing. The series with the higher concentration of TDs shows a delayed reverse annealing of Neff after irradia...

  8. Fabrication of p-type lithium niobate crystals by molybdenum doping and polarization

    Science.gov (United States)

    Tian, Tian; Kong, Yongfa; Liu, Hongde; Liu, Shiguo; Li, Wei; Chen, Shaolin; Xu, Jiayue

    2017-06-01

    The lack of p-type lithium niobate limits it serving as an active material. A series of Mo-doped and pure congruent lithium niobate crystals were grown by Czochralski method under different polarization conditions. Their dominant carrier species were characterized by holographic experiment. The results showed dominant charge carrier species may be changed from electrons to holes when lithium niobate crystal was doped with Mo ions and polarized under the current of 70mA for 30 minutes. It indicated that p-type lithium niobate crystal could be fabricated by Mo-doping and suitably controlling the polarization condition. Mo-doped lithium niobate crystals can be a promising candidate for active components.

  9. Enhancement of p-type mobility in tin monoxide by native defects

    KAUST Repository

    Granato, D. B.

    2013-05-31

    Transparent p-type materials with good mobility are needed to build completely transparent p-n junctions. Tin monoxide (SnO) is a promising candidate. A recent study indicates great enhancement of the hole mobility of SnO grown in Sn-rich environment [E. Fortunato et al., Appl. Phys. Lett. 97, 052105 (2010)]. Because such an environment makes the formation of defects very likely, we study defect effects on the electronic structure to explain the increased mobility. We find that Sn interstitials and O vacancies modify the valence band, inducing higher contributions of the delocalized Sn 5p orbitals as compared to the localized O 2p orbitals, thus increasing the mobility. This mechanism of valence band modification paves the way to a systematic improvement of transparent p-type semiconductors.

  10. A Density Functional Theory Study of Doped Tin Monoxide as a Transparent p-type Semiconductor

    KAUST Repository

    Bianchi Granato, Danilo

    2012-05-01

    In the pursuit of enhancing the electronic properties of transparent p-type semiconductors, this work uses density functional theory to study the effects of doping tin monoxide with nitrogen, antimony, yttrium and lanthanum. An overview of the theoretical concepts and a detailed description of the methods employed are given, including a discussion about the correction scheme for charged defects proposed by Freysoldt and others [Freysoldt 2009]. Analysis of the formation energies of the defects points out that nitrogen substitutes an oxygen atom and does not provide charge carriers. On the other hand, antimony, yttrium, and lanthanum substitute a tin atom and donate n-type carriers. Study of the band structure and density of states indicates that yttrium and lanthanum improves the hole mobility. Present results are in good agreement with available experimental works and help to improve the understanding on how to engineer transparent p-type materials with higher hole mobilities.

  11. Efficiency Improvement of HIT Solar Cells on p-Type Si Wafers

    Directory of Open Access Journals (Sweden)

    Chun-You Wei

    2013-11-01

    Full Text Available Single crystal silicon solar cells are still predominant in the market due to the abundance of silicon on earth and their acceptable efficiency. Different solar-cell structures of single crystalline Si have been investigated to boost efficiency; the heterojunction with intrinsic thin layer (HIT structure is currently the leading technology. The record efficiency values of state-of-the art HIT solar cells have always been based on n-type single-crystalline Si wafers. Improving the efficiency of cells based on p-type single-crystalline Si wafers could provide broader options for the development of HIT solar cells. In this study, we varied the thickness of intrinsic hydrogenated amorphous Si layer to improve the efficiency of HIT solar cells on p-type Si wafers.

  12. Comment on 'Electronic Properties of Red P-Type T12S5 Single Crystals'

    Institute of Scientific and Technical Information of China (English)

    M. Cankurtaran; H. (C)elik

    2007-01-01

    Recently, Gamal et al. [Chin. Phys. Lett. 22 (2005) 1530] reported the results of electrical conductivity, Hall effect and thermoelectric measurements on p-type Th2S5 single crystals. From the experimental data for the temperature dependence of differential thermoelectric power, Gamal et al. determined the values of 2.66 × 10-41 kg and 2.50 × 10-41 kg, respectively, for the effective masses of electrons and holes in p-type Tl2S5, which are about ten orders of magnitude smaller than the free electron mass (9.11 × 10-31 kg). We argue that the anomalously small values obtained for the effective mass of charge carriers in Tl2S5 have no physical significance.

  13. An integrated driving circuit implemented with p-type LTPS TFTs for AMOLED

    Institute of Scientific and Technical Information of China (English)

    ZHAO Li-qing; WU Chun-ya; HAO Da-shou; YAO Ying; MENG Zhi-guo; XIONG Shao-zhen

    2009-01-01

    Based on the technology of low temperature poly silicon thin film transistors (poly-Si-TFTs), a novel p-type TFT AMOLED panel with self-scanned driving circuit is introduced in this paper. A shift register formed with novel p-type TFTs is pro-posed to realize the gate driver. A flip-latch cooperated with the shift register is designed to conduct the data writing. In order to verify the validity of the proposed design, the circuits are simulated with SILVACO TCAD tools, using the MODEL in which the parameters of LTPS TFTs were extracted from the LTPS TFTs made in our lab. The simulation results indicate that the circuit can fulfill the driving function.

  14. Measurement of the dead layer thickness in a p-type point contact germanium detector

    Science.gov (United States)

    Jiang, Hao; Yue, Qian; Li, Yu-Lan; Kang, Ke-Jun; Li, Yuan-Jing; Li, Jin; Lin, Shin-Ted; Liu, Shu-Kui; Ma, Hao; Ma, Jing-Lu; Su, Jian; Tsz-King Wong, Henry; Yang, Li-Tao; Zhao, Wei; Zeng, Zhi

    2016-09-01

    A 994 g mass p-type PCGe detector has been deployed during the first phase of the China Dark matter EXperiment, aiming at direct searches for light weakly interacting massive particles. Measuring the thickness of the dead layer of a p-type germanium detector is an issue of major importance since it determines the fiducial mass of the detector. This work reports a method using an uncollimated 133Ba source to determine the dead layer thickness. The experimental design, data analysis and Monte Carlo simulation processes, as well as the statistical and systematic uncertainties are described. A dead layer thickness of 1.02 mm was obtained based on a comparison between the experimental data and the simulated results. Supported by National Natural Science Foundation of China (10935005, 10945002, 11275107, 11175099)

  15. Preparation and Photovoltaic Properties of p-Type Nano-ZnFe2O4

    Institute of Scientific and Technical Information of China (English)

    LI Zi-heng; ZOU Xu; LI Gen; ZOU Guang-tian

    2012-01-01

    p-Type nano-ZnFe2O4 semiconductors were gained by high-prssure treatment.Surface photovoltaic spectrum(SPS) and transient photovoltaic technology(TPV) were used for studying the photogenerated charge of nano-ZnFe2O4.Results show that the photovoltaic behavior of nano-ZnFe2O4 changed as the processing pressure increased.When the processing pressure was higher than 2 GPa,both SPS response interval and peak changed significantly.XPS results show that the non-lattice oxygen entered into the lattice and the content of lattice oxygen increased with the increase of processing pressure.The material changed from oxygen vacancy type to oxygen excess type and the photoelectric properties changed from n-type to p-type when the processing pressure is higher than 2GPa.

  16. Piezoelectric Nanogenerator Using p-Type ZnO Nanowire Arrays

    KAUST Repository

    Lu, Ming-Pei

    2009-03-11

    Using phosphorus-doped ZnO nanowire (NW) arrays grown on silicon substrate, energy conversion using the p-type ZnO NWs has been demonstrated for the first time. The p-type ZnO NWs produce positive output voltage pulses when scanned by a conductive atomic force microscope (AFM) in contact mode. The output voltage pulse is generated when the tip contacts the stretched side (positive piezoelectric potential side) of the NW. In contrast, the n-type ZnO NW produces negative output voltage when scanned by the AFM tip, and the output voltage pulse is generated when the tip contacts the compressed side (negative potential side) of the NW. In reference to theoretical simulation, these experimentally observed phenomena have been systematically explained based on the mechanism proposed for a nanogenerator. © 2009 American Chemical Society.

  17. In and out of the cation pumps: P-type ATPase structure revisited

    DEFF Research Database (Denmark)

    Bublitz, Maike; Poulsen, Hanne; Morth, Jens Preben

    2010-01-01

    Active transport across membranes is a crucial requirement for life. P-type ATPases build up electrochemical gradients at the expense of ATP by forming and splitting a covalent phosphoenzyme intermediate, coupled to conformational changes in the transmembrane section where the ions are translocated....... The marked increment during the last three years in the number of crystal structures of P-type ATPases has greatly improved our understanding of the similarities and differences of pumps with different ion specificities, since the structures of the Ca2+-ATPase, the Na+,K+-ATPase and the H+-ATPase can now...... be compared directly. Mechanisms for ion gating, charge neutralization and backflow prevention are starting to emerge from comparative structural analysis; and in combination with functional studies of mutated pumps this provides a framework for speculating on how the ions are bound and released as well...

  18. Perspectives of High-Temperature Thermoelectric Applications and p-type and n-type Aluminoborides

    Science.gov (United States)

    Mori, T.

    2016-10-01

    A need exists to develop high-temperature thermoelectric materials which can utilize high-temperature unutilized/waste heat in thermal power plants, steelworks, factories, incinerators, etc., and also focused solar power. The thermal power plant topping application is of potential high impact since it can sizably increase the efficiency of power plants which are the major supply of electrical power for many countries. Higher borides are possible candidates for their particular high-temperature stability, generally large Seebeck coefficients, α, and intrinsic low thermal conductivity. Excellent (|α| > 200 μV/K) p-type or n-type behavior was recently achieved in the aluminoboride YAl x B14 by varying the occupancy of Al sites, x. Finding p-type and n-type counterparts has long been a difficulty of thermoelectric research not limited to borides. This paper reviews possible high-temperature thermoelectric applications, and recent developments and perspectives of thermoelectric aluminoborides.

  19. CALCULATING THE HABITABLE ZONE OF BINARY STAR SYSTEMS. II. P-TYPE BINARIES

    Energy Technology Data Exchange (ETDEWEB)

    Haghighipour, Nader [Institute for Astronomy and NASA Astrobiology Institute, University of Hawaii-Manoa, Honolulu, HI 96822 (United States); Kaltenegger, Lisa [MPIA, Koenigstuhl 17, Heidelberg, D-69117 (Germany)

    2013-11-10

    We have developed a comprehensive methodology for calculating the circumbinary habitable zone (HZ) in planet-hosting P-type binary star systems. We present a general formalism for determining the contribution of each star of the binary to the total flux received at the top of the atmosphere of an Earth-like planet and use the Sun's HZ to calculate the inner and outer boundaries of the HZ around a binary star system. We apply our calculations to the Kepler's currently known circumbinary planetary systems and show the combined stellar flux that determines the boundaries of their HZs. We also show that the HZ in P-type systems is dynamic and, depending on the luminosity of the binary stars, their spectral types, and the binary eccentricity, its boundaries vary as the stars of the binary undergo their orbital motion. We present the details of our calculations and discuss the implications of the results.

  20. Extremely-efficient, miniaturized, long-lived alpha-voltaic power source using liquid gallium

    Science.gov (United States)

    Snyder, G. Jeffrey (Inventor); Patel, Jagdishbhai (Inventor); Fleurial, Jean-Pierre (Inventor)

    2004-01-01

    A power source converts .alpha.-particle energy to electricity for use in electrical systems. Liquid gallium or other liquid medium is subjected to .alpha.-particle emissions. Electrons are freed by collision from neutral gallium atoms to provide gallium ions. The electrons migrate to a cathode while the gallium ions migrate to an anode. A current and/or voltage difference then arises between the cathode and anode because of the work function difference of the cathode and anode. Gallium atoms are regenerated by the receiving of electrons from the anode enabling the generation of additional electrons from additional .alpha.-particle collisions.