Establishment of a computer-controlled retroreflection measurement system at the National Metrology Institute of Turkey (UME)

International Nuclear Information System (INIS)

Samedov, Farhad; Celikel, Oguz; Bazkir, Ozcan

2005-01-01

In order to characterize photometric properties of retroreflectors, a fully automated retroreflector measurement system is designed in National Metrology Institute of Turkey (UME). The system is composed of a lighting projector, a goniometer, filter radiometers, 100 dB transimpedance amplifiers, and 24-bit resolution analog-digital converter card with a special software. The established system provides a new calibration capability to determine the luminous intensity and retroreflection coefficients of the retroreflective materials with the expanded uncertainties of 1.07% and 1.13% (k=2), respectively. The traceability in retroreflection measurements was linked to the detector-based photometric scale of UME

Automation of testing the metrological reliability of nondestructive control systems

International Nuclear Information System (INIS)

Zhukov, Yu.A.; Isakov, V.B.; Karlov, Yu.K.; Kovalevskij, Yu.A.

1987-01-01

Opportunities of microcomputers are used to solve the problem of testing control-measuring systems. Besides the main program the program of data processing when characterizing the nondestructive control systems is written in the microcomputer. The program includes two modules. The first module contains tests-programs, by which accuracy of functional elements of the microcomputer and interface elements with issuing a message to the operator on readiness of the elements for operation and failure of a certain element are determined. The second module includes: calculational programs when determining metrological reliability of measuring channel reliability, a calculational subprogram for random statistical measuring error, time instability and ''dead time''. Automation of testing metrological reliability of the nondestructive control systems increases reliability of determining metrological parameters and reduces time of system testing

Target-Tracking Camera for a Metrology System

Science.gov (United States)

Liebe, Carl; Bartman, Randall; Chapsky, Jacob; Abramovici, Alexander; Brown, David

2009-01-01

An analog electronic camera that is part of a metrology system measures the varying direction to a light-emitting diode that serves as a bright point target. In the original application for which the camera was developed, the metrological system is used to determine the varying relative positions of radiating elements of an airborne synthetic aperture-radar (SAR) antenna as the airplane flexes during flight; precise knowledge of the relative positions as a function of time is needed for processing SAR readings. It has been common metrology system practice to measure the varying direction to a bright target by use of an electronic camera of the charge-coupled-device or active-pixel-sensor type. A major disadvantage of this practice arises from the necessity of reading out and digitizing the outputs from a large number of pixels and processing the resulting digital values in a computer to determine the centroid of a target: Because of the time taken by the readout, digitization, and computation, the update rate is limited to tens of hertz. In contrast, the analog nature of the present camera makes it possible to achieve an update rate of hundreds of hertz, and no computer is needed to determine the centroid. The camera is based on a position-sensitive detector (PSD), which is a rectangular photodiode with output contacts at opposite ends. PSDs are usually used in triangulation for measuring small distances. PSDs are manufactured in both one- and two-dimensional versions. Because it is very difficult to calibrate two-dimensional PSDs accurately, the focal-plane sensors used in this camera are two orthogonally mounted one-dimensional PSDs.

Metrology/viewing system for next generation fusion reactors

International Nuclear Information System (INIS)

Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Menon, M.M.; Dagher, M.A.

1997-01-01

Next generation fusion reactors require accurate measuring systems to verify sub-millimeter alignment of plasma-facing components in the reactor vessel. A metrology system capable of achieving such accuracy must be compatible with the vessel environment of high gamma radiation, high vacuum, elevated temperature, and magnetic field. This environment requires that the system must be remotely deployed. A coherent, frequency modulated laser radar system is being integrated with a remotely operated deployment system to meet these requirements. The metrology/viewing system consists of a compact laser transceiver optics module which is linked through fiber optics to the laser source and imaging units that are located outside of the harsh environment. The deployment mechanism is a telescopic-mast positioning system. This paper identifies the requirements for the International Thermonuclear Experimental Reactor metrology and viewing system, and describes a remotely operated precision ranging and surface mapping system

Laser metrology for a next generation gravimetric mission

Science.gov (United States)

Mottini, Sergio; Biondetti, Giorgio; Cesare, Stefano; Castorina, Giuseppe; Musso, Fabio; Pisani, Marco; Leone, Bruno

2017-11-01

Within the ESA technology research project "Laser Interferometer High Precision tracking for LEO", Thales Alenia Space Italia is developing a laser metrology system for a Next Generation Gravimetric Mission (NGGM) based on satellite-to-satellite tracking. This technique is based on the precise measurement of the displacement between two satellites flying in formation at low altitude for monitoring the variations of Earth's gravity field at high resolution over a long time period. The laser metrology system that has been defined for this mission consists of the following elements: • an heterodyne Michelson interferometer for measuring the distance variation between retroreflectors positioned on the two satellites; • an angle metrology for measuring the orientation of the laser beam in the reference frames of the two satellites; • a lateral displacement metrology for measuring the deviations of the laser beam axis from the target retro-reflector. The laser interferometer makes use of a chopped measurement beam to avoid spurious signals and nonlinearity caused by the unbalance between the strong local beam and the weak return beam. The main results of the design, development and test activities performed on the breadboard of the metrology system are summarized in this paper.

Spectroscopic metrology for isotope composition measurements and transfer standards

Science.gov (United States)

Anyangwe Nwaboh, Javis; Balslev-Harder, David; Kääriäinen, Teemu; Richmond, Craig; Manninen, Albert; Mohn, Joachim; Kiseleva, Maria; Petersen, Jan C.; Werhahn, Olav; Ebert, Volker

2017-04-01

The World Meteorological Organization (WMO) has identified greenhouse gases such as CO2, CH4 and N2O as critical for global climate monitoring. Other molecules such as CO that has an indirect effect of enhancing global warming are also monitored. WMO has stated compatibility goals for atmospheric concentration and isotope ratio measurements of these gases, e.g. 0.1 ppm for CO2 concentration measurements in the northern hemisphere and 0.01 ‰ for δ13C-CO2. For measurements of the concentration of greenhouse gases, gas analysers are typically calibrated with static gas standards e.g. traceable to the WMO scale or to the International System of Units (SI) through a national metrology institute. However, concentrations of target components, e.g. CO, in static gas standards have been observed to drift, and typically the gas matrix as well as the isotopic composition of the target component does not always reflect field gas composition, leading to deviations of the analyser response, even after calibration. The deviations are dependent on the measurement technique. To address this issue, part of the HIGHGAS (Metrology for high-impact greenhouse gases) project [1] focused on the development of optical transfer standards (OTSs) for greenhouse gases, e.g. CO2 and CO, potentially complementing gas standards. Isotope ratio mass spectrometry (IRMS) [2] is currently used to provide state-of-the-art high precision (in the 0.01 ‰ range) measurements for the isotopic composition of greenhouse gases. However, there is a need for field-deployable techniques such as optical isotope ratio spectroscopy (OIRS) that can be combined with metrological measurement methods. Within the HIGHGAS project, OIRS methods and procedures based on e.g. cavity enhanced spectroscopy (CES) and tunable diode laser absorption spectroscopy (TDLAS), matched to metrological principles have been established for the measurement of 13C/12C and 18O/16O ratios in CO2, 15N/14N ratios in N2O, and 13C/12C and 2H

Characterizing opto-electret based paper speakers by using a real-time projection Moiré metrology system

Science.gov (United States)

Chang, Ya-Ling; Hsu, Kuan-Yu; Lee, Chih-Kung

2016-03-01

Advancement of distributed piezo-electret sensors and actuators facilitates various smart systems development, which include paper speakers, opto-piezo/electret bio-chips, etc. The array-based loudspeaker system possess several advantages over conventional coil speakers, such as light-weightness, flexibility, low power consumption, directivity, etc. With the understanding that the performance of the large-area piezo-electret loudspeakers or even the microfluidic biochip transport behavior could be tailored by changing their dynamic behaviors, a full-field real-time high-resolution non-contact metrology system was developed. In this paper, influence of the resonance modes and the transient vibrations of an arraybased loudspeaker system on the acoustic effect were measured by using a real-time projection moiré metrology system and microphones. To make the paper speaker even more versatile, we combine the photosensitive material TiOPc into the original electret loudspeaker. The vibration of this newly developed opto-electret loudspeaker could be manipulated by illuminating different light-intensity patterns. Trying to facilitate the tailoring process of the opto-electret loudspeaker, projection moiré was adopted to measure its vibration. By recording the projected fringes which are modulated by the contours of the testing sample, the phase unwrapping algorithm can give us a continuous phase distribution which is proportional to the object height variations. With the aid of the projection moiré metrology system, the vibrations associated with each distinctive light pattern could be characterized. Therefore, we expect that the overall acoustic performance could be improved by finding the suitable illuminating patterns. In this manuscript, the system performance of the projection moiré and the optoelectret paper speakers were cross-examined and verified by the experimental results obtained.

Coordinate measuring system based on microchip lasers for reverse prototyping

Science.gov (United States)

Iakovlev, Alexey; Grishkanich, Alexsandr S.; Redka, Dmitriy; Tsvetkov, Konstantin

2017-02-01

According to the current great interest concerning Large-Scale Metrology applications in many different fields of manufacturing industry, technologies and techniques for dimensional measurement have recently shown a substantial improvement. Ease-of-use, logistic and economic issues, as well as metrological performance, are assuming a more and more important role among system requirements. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of chip and microlasers as radiators on the linear-angular characteristics of existing measurement systems. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The system consists of a distributed network-based layout, whose modularity allows to fit differently sized and shaped working volumes by adequately increasing the number of sensing units. Differently from existing spatially distributed metrological instruments, the remote sensor devices are intended to provide embedded data elaboration capabilities, in order to share the overall computational load.

Experimental Demonstration of Higher Precision Weak-Value-Based Metrology Using Power Recycling

Science.gov (United States)

Wang, Yi-Tao; Tang, Jian-Shun; Hu, Gang; Wang, Jian; Yu, Shang; Zhou, Zong-Quan; Cheng, Ze-Di; Xu, Jin-Shi; Fang, Sen-Zhi; Wu, Qing-Lin; Li, Chuan-Feng; Guo, Guang-Can

2016-12-01

The weak-value-based metrology is very promising and has attracted a lot of attention in recent years because of its remarkable ability in signal amplification. However, it is suggested that the upper limit of the precision of this metrology cannot exceed that of classical metrology because of the low sample size caused by the probe loss during postselection. Nevertheless, a recent proposal shows that this probe loss can be reduced by the power-recycling technique, and thus enhance the precision of weak-value-based metrology. Here we experimentally realize the power-recycled interferometric weak-value-based beam-deflection measurement and obtain the amplitude of the detected signal and white noise by discrete Fourier transform. Our results show that the detected signal can be strengthened by power recycling, and the power-recycled weak-value-based signal-to-noise ratio can surpass the upper limit of the classical scheme, corresponding to the shot-noise limit. This work sheds light on higher precision metrology and explores the real advantage of the weak-value-based metrology over classical metrology.

In-cell overlay metrology by using optical metrology tool

Science.gov (United States)

Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Park, Hyowon; Liang, Waley; Choi, DongSub; Kim, Nakyoon; Lee, Jeongpyo; Pandev, Stilian; Jeon, Sanghuck; Robinson, John C.

2018-03-01

Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay feedback loop based on after litho optical imaging overlay metrology on scribeline targets. The after litho control loop typically involves high frequency sampling: every lot or nearly every lot. An after etch overlay metrology step is often included, at a lower sampling frequency, in order to characterize and compensate for bias. The after etch metrology step often involves CD-SEM metrology, in this case in-cell and ondevice. This work explores an alternative approach using spectroscopic ellipsometry (SE) metrology and a machine learning analysis technique. Advanced 1x nm DRAM wafers were prepared, including both nominal (POR) wafers with mean overlay offsets, as well as DOE wafers with intentional across wafer overlay modulation. After litho metrology was measured using optical imaging metrology, as well as after etch metrology using both SE and CD-SEM for comparison. We investigate 2 types of machine learning techniques with SE data: model-less and model-based, showing excellent performance for after etch in-cell on-device overlay metrology.

Neural network approximation of nonlinearity in laser nano-metrology system based on TLMI

Energy Technology Data Exchange (ETDEWEB)

Olyaee, Saeed; Hamedi, Samaneh, E-mail: s_olyaee@srttu.edu [Nano-photonics and Optoelectronics Research Laboratory (NORLab), Faculty of Electrical and Computer Engineering, Shahid Rajaee Teacher Training University (SRTTU), Lavizan, 16788, Tehran (Iran, Islamic Republic of)

2011-02-01

In this paper, an approach based on neural network (NN) for nonlinearity modeling in a nano-metrology system using three-longitudinal-mode laser heterodyne interferometer (TLMI) for length and displacement measurements is presented. We model nonlinearity errors that arise from elliptically and non-orthogonally polarized laser beams, rotational error in the alignment of laser head with respect to the polarizing beam splitter, rotational error in the alignment of the mixing polarizer, and unequal transmission coefficients in the polarizing beam splitter. Here we use a neural network algorithm based on the multi-layer perceptron (MLP) network. The simulation results show that multi-layer feed forward perceptron network is successfully applicable to real noisy interferometer signals.

Neural network approximation of nonlinearity in laser nano-metrology system based on TLMI

International Nuclear Information System (INIS)

Olyaee, Saeed; Hamedi, Samaneh

2011-01-01

In this paper, an approach based on neural network (NN) for nonlinearity modeling in a nano-metrology system using three-longitudinal-mode laser heterodyne interferometer (TLMI) for length and displacement measurements is presented. We model nonlinearity errors that arise from elliptically and non-orthogonally polarized laser beams, rotational error in the alignment of laser head with respect to the polarizing beam splitter, rotational error in the alignment of the mixing polarizer, and unequal transmission coefficients in the polarizing beam splitter. Here we use a neural network algorithm based on the multi-layer perceptron (MLP) network. The simulation results show that multi-layer feed forward perceptron network is successfully applicable to real noisy interferometer signals.

Research on rapid agile metrology for manufacturing based on real-time multitask operating system

Science.gov (United States)

Chen, Jihong; Song, Zhen; Yang, Daoshan; Zhou, Ji; Buckley, Shawn

1996-10-01

Rapid agile metrology for manufacturing (RAMM) using multiple non-contact sensors is likely to remain a growing trend in manufacturing. High speed inspecting systems for manufacturing is characterized by multitasks implemented in parallel and real-time events which occur simultaneously. In this paper, we introduce a real-time operating system into RAMM research. A general task model of a class-based object- oriented technology is proposed. A general multitask frame of a typical RAMM system using OPNet is discussed. Finally, an application example of a machine which inspects parts held on a carrier strip is described. With RTOS and OPNet, this machine can measure two dimensions of the contacts at 300 parts/second.

Metrological management evaluation based on ISO10012: an empirical study in ISO-14001-certified Spanish companies

International Nuclear Information System (INIS)

Beltran, Jaime; Rivas, Miguel; Munuzuri, Jesus; Gonzalez, Cristina

2010-01-01

Environmental management systems based on the ISO 14001 standard rely strongly on metrological measurement and confirmation processes to certify the extent to which organizations monitor and improve their environmental behavior. Nevertheless, the literature lacks in studies that assess the influence of these metrological processes on the performance of environmental management in organizations, even now that the international standard ISO 10012 is already available to establish requisites and guidelines for the development of a metrological management system that is compatible with any other standardized management system. This work seeks to assess that influence through the development of an evaluation model for metrological management, which is then validated through an experimental analysis of the results obtained from the application of an audit process in 11 Spanish companies, all ISO-14001-certified and operating in different industrial sectors. (author)

Theory-based metrological traceability in education: A reading measurement network.

Science.gov (United States)

Fisher, William P; Stenner, A Jackson

2016-10-01

Huge resources are invested in metrology and standards in the natural sciences, engineering, and across a wide range of commercial technologies. Significant positive returns of human, social, environmental, and economic value on these investments have been sustained for decades. Proven methods for calibrating test and survey instruments in linear units are readily available, as are data- and theory-based methods for equating those instruments to a shared unit. Using these methods, metrological traceability is obtained in a variety of commercially available elementary and secondary English and Spanish language reading education programs in the U.S., Canada, Mexico, and Australia. Given established historical patterns, widespread routine reproduction of predicted text-based and instructional effects expressed in a common language and shared frame of reference may lead to significant developments in theory and practice. Opportunities for systematic implementations of teacher-driven lean thinking and continuous quality improvement methods may be of particular interest and value.

Enhacement of intrafield overlay using a design based metrology system

Science.gov (United States)

Jo, Gyoyeon; Ji, Sunkeun; Kim, Shinyoung; Kang, Hyunwoo; Park, Minwoo; Kim, Sangwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Maruyama, Kotaro; Park, Byungjun

2016-03-01

As the scales of the semiconductor devices continue to shrink, accurate measurement and control of the overlay have been emphasized for securing more overlay margin. Conventional overlay analysis methods are based on the optical measurement of the overlay mark. However, the overlay data obtained from these optical methods cannot represent the exact misregistration between two layers at the circuit level. The overlay mismatch may arise from the size or pitch difference between the overlay mark and the real pattern. Pattern distortion, caused by CMP or etching, could be a source of the overlay mismatch as well. Another issue is the overlay variation in the real circuit pattern which varies depending on its location. The optical overlay measurement methods, such as IBO and DBO that use overlay mark on the scribeline, are not capable of defining the exact overlay values of the real circuit. Therefore, the overlay values of the real circuit need to be extracted to integrate the semiconductor device properly. The circuit level overlay measurement using CDSEM is time-consuming in extracting enough data to indicate overall trend of the chip. However DBM tool is able to derive sufficient data to display overlay tendency of the real circuit region with high repeatability. An E-beam based DBM(Design Based Metrology) tool can be an alternative overlay measurement method. In this paper, we are going to certify that the overlay values extracted from optical measurement cannot represent the circuit level overlay values. We will also demonstrate the possibility to correct misregistration between two layers using the overlay data obtained from the DBM system.

Effect of measurement error budgets and hybrid metrology on qualification metrology sampling

Science.gov (United States)

Sendelbach, Matthew; Sarig, Niv; Wakamoto, Koichi; Kim, Hyang Kyun (Helen); Isbester, Paul; Asano, Masafumi; Matsuki, Kazuto; Osorio, Carmen; Archie, Chas

2014-10-01

Until now, metrologists had no statistics-based method to determine the sampling needed for an experiment before the start that accuracy experiment. We show a solution to this problem called inverse total measurement uncertainty (TMU) analysis, by presenting statistically based equations that allow the user to estimate the needed sampling after providing appropriate inputs, allowing him to make important "risk versus reward" sampling, cost, and equipment decisions. Application examples using experimental data from scatterometry and critical dimension scanning electron microscope tools are used first to demonstrate how the inverse TMU analysis methodology can be used to make intelligent sampling decisions and then to reveal why low sampling can lead to unstable and misleading results. One model is developed that can help experimenters minimize sampling costs. A second cost model reveals the inadequacy of some current sampling practices-and the enormous costs associated with sampling that provides reasonable levels of certainty in the result. We introduce the strategies on how to manage and mitigate these costs and begin the discussion on how fabs are able to manufacture devices using minimal reference sampling when qualifying metrology steps. Finally, the relationship between inverse TMU analysis and hybrid metrology is explored.

Quantum metrology

International Nuclear Information System (INIS)

Xiang Guo-Yong; Guo Guang-Can

2013-01-01

The statistical error is ineluctable in any measurement. Quantum techniques, especially with the development of quantum information, can help us squeeze the statistical error and enhance the precision of measurement. In a quantum system, there are some quantum parameters, such as the quantum state, quantum operator, and quantum dimension, which have no classical counterparts. So quantum metrology deals with not only the traditional parameters, but also the quantum parameters. Quantum metrology includes two important parts: measuring the physical parameters with a precision beating the classical physics limit and measuring the quantum parameters precisely. In this review, we will introduce how quantum characters (e.g., squeezed state and quantum entanglement) yield a higher precision, what the research areas are scientists most interesting in, and what the development status of quantum metrology and its perspectives are. (topical review - quantum information)

Metrological analysis of a virtual flowmeter-based transducer for cryogenic helium

Energy Technology Data Exchange (ETDEWEB)

Arpaia, P., E-mail: pasquale.arpaia@unina.it [Department of Electrical Engineering and Information Technology, University of Napoli Federico II, Naples (Italy); Technology Department, European Organization for Nuclear Research (CERN), Geneva (Switzerland); Girone, M., E-mail: mario.girone@cern.ch [Technology Department, European Organization for Nuclear Research (CERN), Geneva (Switzerland); Department of Engineering, University of Sannio, Benevento (Italy); Liccardo, A., E-mail: annalisa.liccardo@unina.it [Department of Electrical Engineering and Information Technology, University of Napoli Federico II, Naples (Italy); Pezzetti, M., E-mail: marco.pezzetti@cern.ch [Technology Department, European Organization for Nuclear Research (CERN), Geneva (Switzerland); Piccinelli, F., E-mail: fabio.piccinelli@cern.ch [Department of Mechanical Engineering, University of Brescia, Brescia (Italy)

2015-12-15

The metrological performance of a virtual flowmeter-based transducer for monitoring helium under cryogenic conditions is assessed. At this aim, an uncertainty model of the transducer, mainly based on a valve model, exploiting finite-element approach, and a virtual flowmeter model, based on the Sereg-Schlumberger method, are presented. The models are validated experimentally on a case study for helium monitoring in cryogenic systems at the European Organization for Nuclear Research (CERN). The impact of uncertainty sources on the transducer metrological performance is assessed by a sensitivity analysis, based on statistical experiment design and analysis of variance. In this way, the uncertainty sources most influencing metrological performance of the transducer are singled out over the input range as a whole, at varying operating and setting conditions. This analysis turns out to be important for CERN cryogenics operation because the metrological design of the transducer is validated, and its components and working conditions with critical specifications for future improvements are identified.

Context-based virtual metrology

Science.gov (United States)

Ebersbach, Peter; Urbanowicz, Adam M.; Likhachev, Dmitriy; Hartig, Carsten; Shifrin, Michael

2018-03-01

Hybrid and data feed forward methodologies are well established for advanced optical process control solutions in highvolume semiconductor manufacturing. Appropriate information from previous measurements, transferred into advanced optical model(s) at following step(s), provides enhanced accuracy and exactness of the measured topographic (thicknesses, critical dimensions, etc.) and material parameters. In some cases, hybrid or feed-forward data are missed or invalid for dies or for a whole wafer. We focus on approaches of virtual metrology to re-create hybrid or feed-forward data inputs in high-volume manufacturing. We discuss missing data inputs reconstruction which is based on various interpolation and extrapolation schemes and uses information about wafer's process history. Moreover, we demonstrate data reconstruction approach based on machine learning techniques utilizing optical model and measured spectra. And finally, we investigate metrics that allow one to assess error margin of virtual data input.

Laser source for dimensional metrology: investigation of an iodine stabilized system based on narrow linewidth 633 nm DBR diode

Science.gov (United States)

Rerucha, Simon; Yacoot, Andrew; Pham, Tuan M.; Cizek, Martin; Hucl, Vaclav; Lazar, Josef; Cip, Ondrej

2017-04-01

We demonstrated that an iodine stabilized distributed Bragg reflector (DBR) diode based laser system lasing at a wavelength in close proximity to λ =633 nm could be used as an alternative laser source to the helium-neon lasers in both scientific and industrial metrology. This yields additional advantages besides the optical frequency stability and coherence: inherent traceability, wider optical frequency tuning range, higher output power and high frequency modulation capability. We experimentally investigated the characteristics of the laser source in two major steps: first using a wavelength meter referenced to a frequency comb controlled with a hydrogen maser and then on an interferometric optical bench testbed where we compared the performance of the laser system with that of a traditional frequency stabilized He-Ne laser. The results indicate that DBR diode laser system provides a good laser source for applications in dimensional (nano)metrology, especially in conjunction with novel interferometric detection methods exploiting high frequency modulation or multiaxis measurement systems.

Metrology for γ-radiation spectrometry in a radiation monitoring system

International Nuclear Information System (INIS)

Khaikovich, I.M.; Shevrygin, O.N.; Fominykh, V.I.

1993-01-01

The rapid measurement of the characteristics of radionuclides is a priority when utilizing nuclear energy because of the needs of environmental conservation. This is particularly the case for long-lived nuclear-fuel fission products, 137,137 Cs, 144 Ce, 60 Co, etc., which as a rule are sources of high-energy γ-radiation. These can be measured by γ-ray spectrometry using scintillation or semiconductor devices. When choosing the metrological models, the starting points are the real characteristics of the distribution of the radionuclides in the soil (rock) and the need to estimate their surface activity and the reserves per unit area, i.e., the parameters from which one can estimate the influence of the radioactivity on nature and can decide the use of land areas. The methodology and the calculations presented show that a single metrological system for radiation monitoring can be constructed using multichannel geophysical radiometers (gamma spectrometers) while relying on a system of initial standard samples of small size. Such a metrological system at present provides all the necessary initial means for measuring the effective γ-radiation surface activity of 137,134 Cs and the mass fraction of the natural radioactive elements. Using these initial means of measurement, surveyed areas in the Leningrad and Tula provinces have been certified as State standard samples in terms of the eight parameters: the surface contamination activity of 137,134 Cs, the reserves of these per unit area, the mass fraction of the natural radioactive elements (potassium, uranium and thorium), the power of the equivalent (exposed) γ-radiation dose at a height of 1 m above the surface. It is intended to use the certified metrological surveyed areas to provide traceability and the required measurement accuracy when studying the contamination in European territories resulting from the accident at the Chernobyl nuclear power station

Investigation of metrological parameters of measuring system for small temperature changes

Directory of Open Access Journals (Sweden)

Samynina M. G.

2014-02-01

Full Text Available Metrological parameters of the non-standard contact device were investigated to characterize its performance in temperature change measurements in the specified temperature range. Several series thermistors with a negative temperature coefficient of resistance connected into a linearization circuit were used as the sensing element of the semiconductor device. Increasing the number of thermistors leads to improved circuitry resolving power and reduced dispersion of this parameter. However, there is the question of optimal ratio of the number of thermistors and implemented temperature resolution, due to the nonlinear resolution dependence of the number of series-connected thermoelements. An example of scheme of four similar thermistors as the primary sensor and of a standard measuring instrument, which is working in ohmmeter mode, shows the ability to measure temperature changes at the level of hundredth of a Celsius degree. In this case, a quantization error, which is determined by a resolution of the measuring system, and the ohmmeter accuracy make the main contribution to the overall accuracy of measuring small temperature changes.

Joint Research on Scatterometry and AFM Wafer Metrology

Science.gov (United States)

Bodermann, Bernd; Buhr, Egbert; Danzebrink, Hans-Ulrich; Bär, Markus; Scholze, Frank; Krumrey, Michael; Wurm, Matthias; Klapetek, Petr; Hansen, Poul-Erik; Korpelainen, Virpi; van Veghel, Marijn; Yacoot, Andrew; Siitonen, Samuli; El Gawhary, Omar; Burger, Sven; Saastamoinen, Toni

2011-11-01

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurement systems in measurement comparisons. Additionally novel methods for sophisticated data analysis will be developed and investigated to reach significant reductions of the measurement uncertainties in critical dimension (CD) metrology. One final goal will be the realisation of a wafer based reference standard material for calibration of scatterometers.

What metrology can do to improve the quality of your atmospheric ammonia measurements

Science.gov (United States)

Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Ferracci, Valerio; Cassidy, Nathan; Hook, Josh; Battersby, Ross M.; Tang, Yuk S.; Stevens, Amy C. M.; Jones, Matthew R.; Braban, Christine F.; Gates, Linda; Hangartner, Markus; Sacco, Paolo; Pagani, Diego; Hoffnagle, John A.; Niederhauser, Bernhard

2017-04-01

dependant permeation of a pure substance through a membrane into a stream of pre-purified matrix gas and subsequent dilution to required amount fractions. All relevant parameters are fully traceable to SI-units. Extractive optical analysers can be connected directly to both, stationary and mobile systems for calibration. Moreover, the resulting gas mixture can also be pressurised into coated cylinders by cryo-filling. The mobile system as well as these cylinders can be applied for calibrations of optical instruments in other laboratories and in the field. In addition, an SI-traceable dilution system based on a cascade of critical orifices has been established to dilute NH3 mixtures in the order of μmol/mol stored in cylinders. It is planned to apply this system to calibrate and re-sample gas mixtures in cylinders due to its very economical gas use. Here we present insights into the development of said infrastructure and results performance tests. Moreover, we include results of the study on adsorption/desorption effects in dry as well as humidified matrix gas into the discussion on the generation of reference gas mixtures. Acknowledgement: This work was supported by the European Metrology Research Programme (EMRP). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

Vendor-based laser damage metrology equipment supporting the National Ignition Facility

International Nuclear Information System (INIS)

Campbell, J. H; Jennings, R. T.; Kimmons, J. F.; Kozlowski, M. R.; Mouser, R. P.; Schwatz, S.; Stolz, C. J.; Weinzapfel, C. L.

1998-01-01

A sizable laser damage metrology effort is required as part of optics production and installation for the 192 beam National Ignition Facility (NIF) laser. The large quantities, high damage thresholds, and large apertures of polished and coated optics necessitates vendor-based metrology equipment to assure component quality during production. This equipment must be optimized to provide the required information as rapidly as possible with limited operator experience. The damage metrology tools include: (1) platinum inclusion damage test systems for laser amplifier slabs, (2) laser conditioning stations for mirrors and polarizers, and (3) mapping and damage testing stations for UV transmissive optics. Each system includes a commercial Nd:YAG laser, a translation stage for the optics, and diagnostics to evaluate damage. The scanning parameters, optical layout, and diagnostics vary with the test fluences required and the damage morphologies expected. This paper describes the technical objectives and milestones involved in fulfilling these metrology requirements

Analysis of key technologies for virtual instruments metrology

Science.gov (United States)

Liu, Guixiong; Xu, Qingui; Gao, Furong; Guan, Qiuju; Fang, Qiang

2008-12-01

Virtual instruments (VIs) require metrological verification when applied as measuring instruments. Owing to the software-centered architecture, metrological evaluation of VIs includes two aspects: measurement functions and software characteristics. Complexity of software imposes difficulties on metrological testing of VIs. Key approaches and technologies for metrology evaluation of virtual instruments are investigated and analyzed in this paper. The principal issue is evaluation of measurement uncertainty. The nature and regularity of measurement uncertainty caused by software and algorithms can be evaluated by modeling, simulation, analysis, testing and statistics with support of powerful computing capability of PC. Another concern is evaluation of software features like correctness, reliability, stability, security and real-time of VIs. Technologies from software engineering, software testing and computer security domain can be used for these purposes. For example, a variety of black-box testing, white-box testing and modeling approaches can be used to evaluate the reliability of modules, components, applications and the whole VI software. The security of a VI can be assessed by methods like vulnerability scanning and penetration analysis. In order to facilitate metrology institutions to perform metrological verification of VIs efficiently, an automatic metrological tool for the above validation is essential. Based on technologies of numerical simulation, software testing and system benchmarking, a framework for the automatic tool is proposed in this paper. Investigation on implementation of existing automatic tools that perform calculation of measurement uncertainty, software testing and security assessment demonstrates the feasibility of the automatic framework advanced.

A metrology system for a high resolution cavity beam position monitor system

Science.gov (United States)

Walston, Sean; Boogert, Stewart; Chung, Carl; Fitsos, Pete; Frisch, Joe; Gronberg, Jeff; Hayano, Hitoshi; Hinton, Shantell; Honda, Yosuke; Khainovski, Oleg; Kolomensky, Yury; Loscutoff, Peter; Lyapin, Alexey; Malton, Stephen; May, Justin; McCormick, Douglas; Meller, Robert; Miller, David; Orimoto, Toyoko; Ross, Marc; Slater, Mark; Smith, Steve; Smith, Tonee; Terunuma, Nobuhiro; Thomson, Mark; Urakawa, Junji; Vogel, Vladimir; Ward, David; White, Glen

2013-11-01

International Linear Collider (ILC) interaction region beam sizes and component position stability requirements will likely be as small as a few nanometers. It is important to the ILC design effort to demonstrate that these tolerances can be achieved-ideally using a beam-based stability measurement. We developed a high resolution RF cavity Beam Position Monitor (BPM) system. A triplet of these BPMs, installed in the extraction line of the KEK Accelerator Test Facility (ATF) and tested with its ultra-low emittance beam, achieved a position measurement resolution of 15 nm. A metrology system for the three BPMs was subsequently installed. This system employed optical encoders to measure each BPM's position and orientation relative to a zero-coefficient of thermal expansion carbon fiber frame. We have demonstrated that the three BPMs behave as a rigid-body at the level of less than 5 nm.

Comparison of asphere measurements by tactile and optical metrological instruments

NARCIS (Netherlands)

Bergmans, R.H.; Nieuwenkamp, H.J.; Kok, G.J.P.; Blobel, G.; Nouira, H.; Küng, A.; Baas, M.; Voert, M.J.A. te; Baer, G.; Stuerwald, S.

2015-01-01

A comparison of topography measurements of aspherical surfaces was carried out by European metrology institutes, other research institutes and a company as part of an European metrology research project. In this paper the results of this comparison are presented. Two artefacts were circulated, a

Development of an ultrasensitive interferometry system as a key to precision metrology applications

Science.gov (United States)

Gohlke, Martin; Schuldt, Thilo; Weise, Dennis; Johann, Ulrich; Peters, Achim; Braxmaier, Claus

2009-06-01

We present a symmetric heterodyne interferometer as a prototype of a highly sensitive translation and tilt measurement system. This compact optical metrology system was developed over the past several years by EADS Astrium (Friedrichshafen) in cooperation with the Humboldt-University (Berlin) and the university of applied science Konstanz (HTWG-Konstanz). The noise performance was tested at frequencies between 10-4 and 3 Hz, the noise levels are below 1 nm/Hz 1/2 for translation and below 1 μrad/Hz1/2, for tilt measurements. For frequencies higher than 10 mHz noise levels below 5pm/Hz1/2 and 4 nrad/Hz1/2 respectively, were demonstrated. Based on this highly sensitive metrology system we also developed a dilatometer for the characterization of the CTE (coefficient of thermal expansion) of various materials, i.e. CFRP (carbon fiber reinforced plastic) or Zerodur. The currently achieved sensitivity of these measurements is better than 10-7 K-1. Future planned applications of the interferometer include ultra-high-precision surface profiling and characterization of actuator noise in low-noise opto-mechanics setups. We will give an overview of the current experimental setup and the latest measurement results.

Utilization of the research and measurement reactor Braunschweig for neutron metrology

International Nuclear Information System (INIS)

Alberts, W.G.

1982-01-01

The objectives of the Physikalisch-Technische Bundesanstalt (PTB) with regard to neutron metrology are briefly described. The use of the PTB's Research and Measuring Reactor as neutron source for metrological purposes is discussed. Reference neutron beams are described which serve as irradiation facilities for the calibration of detectors for radiation protection purposes in the frame of the legal metrology work in the PTB. (orig.) [de

Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy.

Science.gov (United States)

Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal

2016-05-01

X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or "tophat" beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicability in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.

Temperature metrology

Science.gov (United States)

Fischer, J.; Fellmuth, B.

2005-05-01

The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national

Temperature metrology

International Nuclear Information System (INIS)

Fischer, J; Fellmuth, B

2005-01-01

The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national

Economic benefits of metrology in manufacturing

DEFF Research Database (Denmark)

Savio, Enrico; De Chiffre, Leonardo; Carmignato, S.

2016-01-01

examples from industrial production, in which the added value of metrology in manufacturing is discussed and quantified. Case studies include: general manufacturing, forging, machining, and related metrology. The focus of the paper is on the improved effectiveness of metrology when used at product...... and process design stages, as well as on the improved accuracy and efficiency of manufacturing through better measuring equipment and process chains with integrated metrology for process control.......In streamlined manufacturing systems, the added value of inspection activities is often questioned, and metrology in particular is sometimes considered only as an avoidable expense. Documented quantification of economic benefits of metrology is generally not available. This work presents concrete...

Speckle-based at-wavelength metrology of x-ray optics at Diamond Light Source

Science.gov (United States)

Wang, Hongchang; Zhou, Tunhe; Kashyap, Yogesh; Sawhney, Kawal

2017-08-01

To achieve high resolution and sensitivity on the nanometer scale, further development of X-ray optics is required. Although ex-situ metrology provides valuable information about X-ray optics, the ultimate performance of X-ray optics is critically dependent on the exact nature of the working conditions. Therefore, it is equally important to perform in-situ metrology at the optics' operating wavelength (`at-wavelength' metrology) to optimize the performance of X-ray optics and correct and minimize the collective distortions of the upstream beamline optics, e.g. monochromator, windows, etc. Speckle-based technique has been implemented and further improved at Diamond Light Source. We have demonstrated that the angular sensitivity for measuring the slope error of an optical surface can reach an accuracy of two nanoradians. The recent development of the speckle-based at-wavelength metrology techniques will be presented. Representative examples of the applications of the speckle-based technique will also be given - including optimization of X-ray mirrors and characterization of compound refraction lenses. Such a high-precision metrology technique will be extremely beneficial for the manufacture and in-situ alignment/optimization of X-ray mirrors for next-generation synchrotron beamlines.

Adhesive Bonding for Optical Metrology Systems in Space Applications

International Nuclear Information System (INIS)

Gohlke, Martin; Schuldt, Thilo; Braxmaier, Claus; Döringshoff, Klaus; Peters, Achim; Johann, Ulrich; Weise, Dennis

2015-01-01

Laser based metrology systems become more and more attractive for space applications and are the core elements of planned missions such as LISA (NGO, eLISA) or NGGM where laser interferometry is used for distance measurements between satellites. The GRACE-FO mission will for the first time demonstrate a Laser Ranging Instrument (LRI) in space, starting 2017. Laser based metrology also includes optical clocks/references, either as ultra-stable light source for high sensitivity interferometry or as scientific payload e.g. proposed in fundamental physics missions such as mSTAR (mini SpaceTime Asymmetry Research), a mission dedicated to perform a Kennedy-Thorndike experiment on a satellite in a low-Earth orbit. To enable the use of existing optical laboratory setups, optimization with respect to power consumption, weight and dimensions is necessary. At the same time the thermal and structural stability must be increased. Over the last few years we investigated adhesive bonding of optical components to thermally highly stable glass ceramics as an easy-to-handle assembly integration technology. Several setups were implemented and tested for potential later use in space applications. We realized a heterodyne LISA related interferometer with demonstrated noise levels in the pm-range for translation measurement and nano-radiant-range for tilt measurements and two iodine frequency references on Elegant Breadboard (EBB) and Engineering Model (EM) level with frequency stabilities in the 10 -15 range for longer integration times. The EM setup was thermally cycled and vibration tested. (paper)

Metrology of image placement

International Nuclear Information System (INIS)

Starikov, Alexander

1998-01-01

Metrology of registration, overlay and alignment offset in microlithography are discussed. Requirements and limitations are traced to the device ground rules and the definitions of edge, linewidth and centerline. Precision, accuracy, system performance and metrology in applications are discussed. The impact of image acquisition and data handling on performance is elucidated. Much attention is given to the manufacturing environment and effects of processing. General new methods of metrology error diagnostics and technology characterization are introduced and illustrated. Applications of these diagnostics to tests of tool performance, error diagnostics and culling, as well as to process integration in manufacturing are described. Realistic overlay reference materials and results of accuracy evaluations are discussed. Requirements in primary standards and alternative metrology are explained. The role and capability of SEM based overlay metrology is described, along with applications to device overlay metrology

Physical characterization and performance evaluation of an x-ray micro-computed tomography system for dimensional metrology applications

DEFF Research Database (Denmark)

Hiller, Jochen; Maisl, Michael; Reindl, Leonard M

2012-01-01

This paper presents physical and metrological characterization measurements conducted for an industrial x-ray micro-computed tomography (CT) system. As is well known in CT metrology, many factors, e.g., in the scanning and reconstruction process, the image processing, and the 3D data evaluation...... components of a CT scanner, i.e. the x-ray tube and the flat-panel detector, are characterized. The contrast and noise transfer property of the scanner is obtained using image-processing methods based on linear systems theory. A long-term temperature measurement in the scanner cabinet has been carried out....... The dimensional measurement property has been quantified by using a calibrated ball-bar and uncertainty budgeting. Information about the performance of a CT scanner system in terms of contrast and noise transmission and sources of geometrical errors will help plan CT scans more efficiently. In particular...

A metrology system for a high resolution cavity beam position monitor system

Energy Technology Data Exchange (ETDEWEB)

Walston, Sean, E-mail: walston2@llnl.gov [Lawrence Livermore National Laboratory, 7000 East Ave., L-181, Livermore, CA 94550 (United States); Boogert, Stewart [Royal Holloway, University of London, Egham (United Kingdom); Chung, Carl; Fitsos, Pete [Lawrence Livermore National Laboratory, 7000 East Ave., L-181, Livermore, CA 94550 (United States); Frisch, Joe [Stanford Linear Accelerator Center, Menlo Park, CA (United States); Gronberg, Jeff [Lawrence Livermore National Laboratory, 7000 East Ave., L-181, Livermore, CA 94550 (United States); Hayano, Hitoshi [High Energy Accelerator Research Organization (KEK), Tsukuba-shi, Ibaraki-ken (Japan); Hinton, Shantell [Stanford Linear Accelerator Center, Menlo Park, CA (United States); Honda, Yosuke [High Energy Accelerator Research Organization (KEK), Tsukuba-shi, Ibaraki-ken (Japan); Khainovski, Oleg; Kolomensky, Yury; Loscutoff, Peter [University of California and Lawrence Berkeley National Laboratory, Berkeley, CA (United States); Lyapin, Alexey; Malton, Stephen [University College London, London (United Kingdom); May, Justin; McCormick, Douglas [Stanford Linear Accelerator Center, Menlo Park, CA (United States); Meller, Robert [Cornell University, Ithaca, NY (United States); Miller, David [University College London, London (United Kingdom); Orimoto, Toyoko [University of California and Lawrence Berkeley National Laboratory, Berkeley, CA (United States); California Institute of Technology, Pasadena, CA (United States); Ross, Marc [Stanford Linear Accelerator Center, Menlo Park, CA (United States); Fermi National Accelerator Laboratory, Batavia, IL (United States); and others

2013-11-11

International Linear Collider (ILC) interaction region beam sizes and component position stability requirements will likely be as small as a few nanometers. It is important to the ILC design effort to demonstrate that these tolerances can be achieved–ideally using a beam-based stability measurement. We developed a high resolution RF cavity Beam Position Monitor (BPM) system. A triplet of these BPMs, installed in the extraction line of the KEK Accelerator Test Facility (ATF) and tested with its ultra-low emittance beam, achieved a position measurement resolution of 15 nm. A metrology system for the three BPMs was subsequently installed. This system employed optical encoders to measure each BPM's position and orientation relative to a zero-coefficient of thermal expansion carbon fiber frame. We have demonstrated that the three BPMs behave as a rigid-body at the level of less than 5 nm.

Consultative committee on ionizing radiation: Impact on radionuclide metrology

International Nuclear Information System (INIS)

Karam, L.R.; Ratel, G.

2016-01-01

In response to the CIPM MRA, and to improve radioactivity measurements in the face of advancing technologies, the CIPM's consultative committee on ionizing radiation developed a strategic approach to the realization and validation of measurement traceability for radionuclide metrology. As a consequence, measurement institutions throughout the world have devoted no small effort to establish radionuclide metrology capabilities, supported by active quality management systems and validated through prioritized participation in international comparisons, providing a varied stakeholder community with measurement confidence. - Highlights: • Influence of CIPM MRA on radionuclide metrology at laboratories around the world. • CCRI strategy: to be the “undisputed hub for ionizing radiation global metrology.” • CCRI Strategic Plan stresses importance of measurement confidence for stakeholder. • NMIs increasing role in radionuclide metrology by designating institutions (DIs). • NMIs and DIs establish quality systems; validate capabilities through comparisons.

Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy

International Nuclear Information System (INIS)

Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal

2016-01-01

X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or “tophat” beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicability in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.

Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy

Energy Technology Data Exchange (ETDEWEB)

Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal, E-mail: kawal.sawhney@diamond.ac.uk [Diamond Light Source, Harwell Science and Innovation Campus, Didcot OX11 0DE (United Kingdom)

2016-05-15

X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or “tophat” beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicability in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.

Metrological control of instruments, equipment and measurement system for ultrasonic meters of flow; Controle metrologico de instrumentos, equipamentos e sistema de medicao para medidores ultra-sonicos de vazao

Energy Technology Data Exchange (ETDEWEB)

Palacios, Oscar de

2004-07-01

Following the actual tendency to obtaining greater precision in Natural Gas measurement, in the past few years the use of Ultrasonic Flow Meters as Custody Transfer applications has grown significantly. There are several units currently operating in Brazil. The legislation for model approval, measure system certification and periodical metrological control of the above mentioned equipment, is currently under elaboration final stage. It was placed under public inquire through the 'Portaria 037' of 2004 of INMETRO, which proposes the authorization to perform the Metrological control by the Operator, once it has a quality system implemented according NBR ISO 9001-2000 and/or ISO 17025. This paper describes the verification procedure adopted by most of ultrasonic meters manufacturers. It also describes the application of the procedure for create the 'Metrological Control System of the Measurement System' of a 12'' Ultrasonic Meter installed and operating, with 3 years operation's data. (author)

Diffraction-based overlay metrology for double patterning technologies

Science.gov (United States)

Dasari, Prasad; Korlahalli, Rahul; Li, Jie; Smith, Nigel; Kritsun, Oleg; Volkman, Cathy

2009-03-01

The extension of optical lithography to 32nm and beyond is made possible by Double Patterning Techniques (DPT) at critical levels of the process flow. The ease of DPT implementation is hindered by increased significance of critical dimension uniformity and overlay errors. Diffraction-based overlay (DBO) has shown to be an effective metrology solution for accurate determination of the overlay errors associated with double patterning [1, 2] processes. In this paper we will report its use in litho-freeze-litho-etch (LFLE) and spacer double patterning technology (SDPT), which are pitch splitting solutions that reduce the significance of overlay errors. Since the control of overlay between various mask/level combinations is critical for fabrication, precise and accurate assessment of errors by advanced metrology techniques such as spectroscopic diffraction based overlay (DBO) and traditional image-based overlay (IBO) using advanced target designs will be reported. A comparison between DBO, IBO and CD-SEM measurements will be reported. . A discussion of TMU requirements for 32nm technology and TMU performance data of LFLE and SDPT targets by different overlay approaches will be presented.

Laser metrology and optic active control system for GAIA

Science.gov (United States)

D'Angelo, F.; Bonino, L.; Cesare, S.; Castorina, G.; Mottini, S.; Bertinetto, F.; Bisi, M.; Canuto, E.; Musso, F.

2017-11-01

The Laser Metrology and Optic Active Control (LM&OAC) program has been carried out under ESA contract with the purpose to design and validate a laser metrology system and an actuation mechanism to monitor and control at microarcsec level the stability of the Basic Angle (angle between the lines of sight of the two telescopes) of GAIA satellite. As part of the program, a breadboard (including some EQM elements) of the laser metrology and control system has been built and submitted to functional, performance and environmental tests. In the followings we describe the mission requirements, the system architecture, the breadboard design, and finally the performed validation tests. Conclusion and appraisals from this experience are also reported.

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

Science.gov (United States)

Lee, Hong-Goo; Schmitt-Weaver, Emil; Kim, Min-Suk; Han, Sang-Jun; Kim, Myoung-Soo; Kwon, Won-Taik; Park, Sung-Ki; Ryan, Kevin; Theeuwes, Thomas; Sun, Kyu-Tae; Lim, Young-Wan; Slotboom, Daan; Kubis, Michael; Staecker, Jens

2015-03-01

While semiconductor manufacturing moves toward the 7nm node for logic and 15nm node for memory, an increased emphasis has been placed on reducing the influence known contributors have toward the on product overlay budget. With a machine learning technique known as function approximation, we use a neural network to gain insight to how known contributors, such as those collected with scanner metrology, influence the on product overlay budget. The result is a sufficiently trained function that can approximate overlay for all wafers exposed with the lithography system. As a real world application, inline metrology can be used to measure overlay for a few wafers while using the trained function to approximate overlay vector maps for the entire lot of wafers. With the approximated overlay vector maps for all wafers coming off the track, a process engineer can redirect wafers or lots with overlay signatures outside the standard population to offline metrology for excursion validation. With this added flexibility, engineers will be given more opportunities to catch wafers that need to be reworked, resulting in improved yield. The quality of the derived corrections from measured overlay metrology feedback can be improved using the approximated overlay to trigger, which wafers should or shouldn't be, measured inline. As a development or integration engineer the approximated overlay can be used to gain insight into lots and wafers used for design of experiments (DOE) troubleshooting. In this paper we will present the results of a case study that follows the machine learning function approximation approach to data analysis, with production overlay measured on an inline metrology system at SK hynix.

Metrology measurements for large-aperture VPH gratings

Science.gov (United States)

Zheng, Jessica R.; Gers, Luke; Heijmans, Jeroen

2013-09-01

The High Efficiency and Resolution Multi Element Spectrograph (HERMES) for the Australian Astronomical Observatory (AAO) uses four large aperture, high angle of incidence volume phase holographic gratings (VPHG) for high resolution `Galactic archaeology' spectroscopy. The large clear aperture, the high diffraction efficiency, the line frequency homogeneity, and mosaic alignment made manufacturing and testing challenging. We developed new metrology systems at the AAO to verify the performance of these VPH gratings. The measured diffraction efficiencies and line frequency of the VPH gratings received so far meet the vendor's provided data. The wavefront quality for the Blue VPH grating is good but the Green and Red VPH gratings need to be post polishing.

Advanced applications of scatterometry based optical metrology

Science.gov (United States)

Dixit, Dhairya; Keller, Nick; Kagalwala, Taher; Recchia, Fiona; Lifshitz, Yevgeny; Elia, Alexander; Todi, Vinit; Fronheiser, Jody; Vaid, Alok

2017-03-01

The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, and lower cost per transistor. These developments in the field of semiconductor manufacturing along with the overall minimization of the size of transistors require continuous development of metrology tools used for characterization of these complex 3D device architectures. Optical scatterometry or optical critical dimension (OCD) is one of the most prevalent inline metrology techniques in semiconductor manufacturing because it is a quick, precise and non-destructive metrology technique. However, at present OCD is predominantly used to measure the feature dimensions such as line-width, height, side-wall angle, etc. of the patterned nano structures. Use of optical scatterometry for characterizing defects such as pitch-walking, overlay, line edge roughness, etc. is fairly limited. Inspection of process induced abnormalities is a fundamental part of process yield improvement. It provides process engineers with important information about process errors, and consequently helps optimize materials and process parameters. Scatterometry is an averaging technique and extending it to measure the position of local process induced defectivity and feature-to-feature variation is extremely challenging. This report is an overview of applications and benefits of using optical scatterometry for characterizing defects such as pitch-walking, overlay and fin bending for advanced technology nodes beyond 7nm. Currently, the optical scatterometry is based on conventional spectroscopic ellipsometry and spectroscopic reflectometry measurements, but generalized ellipsometry or Mueller matrix spectroscopic ellipsometry data provides important, additional information about complex structures that exhibit anisotropy and depolarization effects. In addition the symmetry-antisymmetry properties associated with Mueller matrix (MM) elements

Laser metrology in fluid mechanics granulometry, temperature and concentration measurements

CERN Document Server

Boutier, Alain

2013-01-01

In fluid mechanics, non-intrusive measurements are fundamental in order to improve knowledge of the behavior and main physical phenomena of flows in order to further validate codes.The principles and characteristics of the different techniques available in laser metrology are described in detail in this book.Velocity, temperature and concentration measurements by spectroscopic techniques based on light scattered by molecules are achieved by different techniques: laser-induced fluorescence, coherent anti-Stokes Raman scattering using lasers and parametric sources, and absorption sp

Optical vortex metrology for non-destructive testing

DEFF Research Database (Denmark)

Wang, W.; Hanson, Steen Grüner

2009-01-01

Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis.......Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis....

Measurement capabilities of the Bendix Metrology Organization

International Nuclear Information System (INIS)

Barnes, L.M.

1984-01-01

The purpose of this manual is to communicate the measurement and calibration capabilities of the Metrology Organization of the Bendix Kansas City Division. Included is a listing of the measurement types and ranges available, and the accuracies normally attainable under conditions at the Kansas City Division. Also described are currently used standards and measurement devices. The manual is divided into four major sections, each describing a broad general area of measurement: mechanical; environmental, gas, liquid; electrical; and optical and radiation

Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

Science.gov (United States)

Chen, Kai-Hsiung; Huang, Guo-Tsai; Hsieh, Hung-Chih; Ni, Wei-Feng; Chuang, S. M.; Chuang, T. K.; Ke, Chih-Ming; Huang, Jacky; Rao, Shiuan-An; Cumurcu Gysen, Aysegul; d'Alfonso, Maxime; Yueh, Jenny; Izikson, Pavel; Soco, Aileen; Wu, Jon; Nooitgedagt, Tjitte; Ottens, Jeroen; Kim, Yong Ho; Ebert, Martin

2017-03-01

On-product overlay requirements are becoming more challenging with every next technology node due to the continued decrease of the device dimensions and process tolerances. Therefore, current and future technology nodes require demanding metrology capabilities such as target designs that are robust towards process variations and high overlay measurement density (e.g. for higher order process corrections) to enable advanced process control solutions. The impact of advanced control solutions based on YieldStar overlay data is being presented in this paper. Multi patterning techniques are applied for critical layers and leading to additional overlay measurement demands. The use of 1D process steps results in the need of overlay measurements relative to more than one layer. Dealing with the increased number of overlay measurements while keeping the high measurement density and metrology accuracy at the same time presents a challenge for high volume manufacturing (HVM). These challenges are addressed by the capability to measure multi-layer targets with the recently introduced YieldStar metrology tool, YS350. On-product overlay results of such multi-layers and standard targets are presented including measurement stability performance.

Impact of the ITRS Metrology Roadmap

International Nuclear Information System (INIS)

Diebold, Alain C.

2001-01-01

The International Technology Roadmap for Semiconductors (ITRS) provides the semiconductor industry with the timing of critical technology needs for future generations of integrated circuits. The Metrology roadmap in the ITRS describes the measurement needs based on the process requirements found in the Lithography, Front End Processes, Interconnect, and Packaging Roadmaps. This paper illustrates the impact of the Metrology Roadmap on the development of key measurement technology

Elements for successful sensor-based process control {Integrated Metrology}

International Nuclear Information System (INIS)

Butler, Stephanie Watts

1998-01-01

Current productivity needs have stimulated development of alternative metrology, control, and equipment maintenance methods. Specifically, sensor applications provide the opportunity to increase productivity, tighten control, reduce scrap, and improve maintenance schedules and procedures. Past experience indicates a complete integrated solution must be provided for sensor-based control to be used successfully in production. In this paper, Integrated Metrology is proposed as the term for an integrated solution that will result in a successful application of sensors for process control. This paper defines and explores the perceived four elements of successful sensor applications: business needs, integration, components, and form. Based upon analysis of existing successful commercially available controllers, the necessary business factors have been determined to be strong, measurable industry-wide business needs whose solution is profitable and feasible. This paper examines why the key aspect of integration is the decision making process. A detailed discussion is provided of the components of most importance to sensor based control: decision-making methods, the 3R's of sensors, and connectivity. A metric for one of the R's (resolution) is proposed to allow focus on this important aspect of measurement. A form for these integrated components which synergistically partitions various aspects of control at the equipment and MES levels to efficiently achieve desired benefits is recommended

Elements for successful sensor-based process control {Integrated Metrology}

Science.gov (United States)

Butler, Stephanie Watts

1998-11-01

Current productivity needs have stimulated development of alternative metrology, control, and equipment maintenance methods. Specifically, sensor applications provide the opportunity to increase productivity, tighten control, reduce scrap, and improve maintenance schedules and procedures. Past experience indicates a complete integrated solution must be provided for sensor-based control to be used successfully in production. In this paper, Integrated Metrology is proposed as the term for an integrated solution that will result in a successful application of sensors for process control. This paper defines and explores the perceived four elements of successful sensor applications: business needs, integration, components, and form. Based upon analysis of existing successful commercially available controllers, the necessary business factors have been determined to be strong, measurable industry-wide business needs whose solution is profitable and feasible. This paper examines why the key aspect of integration is the decision making process. A detailed discussion is provided of the components of most importance to sensor based control: decision-making methods, the 3R's of sensors, and connectivity. A metric for one of the R's (resolution) is proposed to allow focus on this important aspect of measurement. A form for these integrated components which synergistically partitions various aspects of control at the equipment and MES levels to efficiently achieve desired benefits is recommended.

Importance of education and competence maintenance in metrology field (measurement science)

International Nuclear Information System (INIS)

Dobiliene, J; Meskuotiene, A

2015-01-01

For certain tasks in metrology field trained employers might be necessary to fulfill specific requirements. It is important to pay attention that metrologists are responsible for fluent work of devices that belong to huge variety of vide spectrum of measurements. People who perform measurements (that are related to our safety, security or everyday life) with reliable measuring instruments must be sure for trueness of their results or conclusions. So with the purpose to reach the harmony between the ordinary man and his used means it is very important to ensure competence of specialists that are responsible for mentioned harmony implementation. Usually these specialists have a university degree and perform highly specified tasks in science, industry or laboratories. Their task is quite narrow. For example, type approval of measuring instrument or calibration and verification. Due to the fact that the number of such employers and their tasks is relatively small in the field of legal metrology, this paper focuses on the significance of training and qualification of legal metrology officers

Measuring up to the challenges of the 21st century. An international evaluation of the Centre for Metrology and Accreditation

Energy Technology Data Exchange (ETDEWEB)

Clapman, P.; Kaarls, R.; Temmes, M.

1997-04-01

The international evaluation of the Centre for Metrology and Accreditation (MIKES) is part of the process in which all relevant industrial and technology policy measures and organizations under the auspices of the Ministry of Trade and Industry (MTI) are being evaluated with the aim of improving their effectiveness. The overall conclusion of the evaluation is that MIKES is serving the country well. An effective national measurement system (FINMET) is being maintained which provides a wide range of calibration services covering most of the nation`s needs. The accreditation service (FINAS) is now well established, is operating effectively, and has good prospects for growth. The evaluators present, however, a number of proposals (including 33 specific recommendations) where they feel that the metrology and accreditation arrangements could be better-suited to meet future national and international challenges. According to the recommendations the Finnish quality policy framework should be developed in a consistent way. There is a need of a comprehensive governmental quality policy statement upon which the inter-ministry coordination and harmonization of various conformity assessment activities can be based. MIKES should retain its current status as an agency within MTI. The national measurement system should be more centralised and a new purpose-built national standards laboratory should be procured. The responsibility for legal metrology should be transferred to MIKES. The terms of reference and membership of Advisory Committee for Metrology, as well as the Advisory Committee for Accreditation should be revised to ensure wider representation of all relevant, and especially industrial interests

Celtiberian metrology and its romanization

Directory of Open Access Journals (Sweden)

Leonard A. CURCHIN

2013-05-01

Full Text Available Celtiberian metrology has scarcely been investigated until now, with the exception of coin weights. On the basis of measurements of pre-Roman mud bricks, a Celtiberian foot of 24 cm is proposed. With regard to weights, we can accept a module of 9 g for silver jewelry and some bronze coins; however, loom weights do not conform to any metrological system. Over time, Roman measures of length (as indicated by the dimensions of bricks, tiles and architectural monuments and weight were adopted.

Overlay improvement methods with diffraction based overlay and integrated metrology

Science.gov (United States)

Nam, Young-Sun; Kim, Sunny; Shin, Ju Hee; Choi, Young Sin; Yun, Sang Ho; Kim, Young Hoon; Shin, Si Woo; Kong, Jeong Heung; Kang, Young Seog; Ha, Hun Hwan

2015-03-01

To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern's behavior, but also the larger measurement samples are inevitable for minimizing statistical errors and better estimation of circumstance in a lot. From these reasons, diffraction based overlay (DBO) and integrated metrology (IM) were mainly proposed as new approaches for overlay enhancement in this paper.

New reference object for metrological performance testing of industrial CT systems

DEFF Research Database (Denmark)

Müller, Pavel; Hiller, Jochen; Cantatore, Angela

2012-01-01

This paper presents a new reference object, so called “CT ball plate”, used for metrological performance testing of industrial CT systems, and discusses both the calibration procedure using a tactile coordinate measuring machine and the first results carried out using an industrial CT scanner....... This artefact can be used to determine several characteristics of the CT system like, probing errors of spheres, length measuring errors between sphere centers, measurement errors in the whole CT volume and effects in connection with image artefacts....

Metrological AFMs and its application for versatile nano-dimensional metrology tasks

Science.gov (United States)

Dai, Gaoliang; Dziomba, T.; Pohlenz, F.; Danzebrink, H.-U.; Koenders, L.

2010-08-01

Traceable calibrations of various micro and nano measurement devices are crucial tasks for ensuring reliable measurements for micro and nanotechnology. Today metrological AFM are widely used for traceable calibrations of nano dimensional standards. In this paper, we introduced the developments of metrological force microscopes at PTB. Of the three metrological AFMs described here, one is capable of measuring in a volume of 25 mm x 25 mm x 5 mm. All instruments feature interferometers and the three-dimensional position measurements are thus directly traceable to the metre definition. Some calibration examples on, for instance, flatness standards, step height standards, one and two dimensional gratings are demonstrated.

Dimensional quality control of Ti-Ni dental file by optical coordinate metrology and computed tomography

DEFF Research Database (Denmark)

Yagüe-Fabra, J.A.; Tosello, Guido; Ontiveros, S.

2014-01-01

Endodontic dental files usually present complex 3D geometries, which make the complete measurement of the component very challenging with conventional micro metrology tools. Computed Tomography (CT) can represent a suitable alternative solution to micro metrology tools based on optical and tactile...... techniques. However, the establishment of CT systems traceability when measuring 3D complex geometries is still an open issue. In this work, to verify the quality of the CT dimensional measurements, the dental file has been measured both with a μCT system and an optical CMM (OCMM). The uncertainty...

Metrological traceability of carbon dioxide measurements in atmosphere and seawater

International Nuclear Information System (INIS)

Rolle, F; Pessana, E; Sega, M

2017-01-01

The accurate determination of gaseous pollutants is fundamental for the monitoring of the trends of these analytes in the environment and the application of the metrological concepts to this field is necessary to assure the reliability of the measurement results. In this work, an overview of the activity carried out at Istituto Nazionale di Ricerca Metrologica to establish the metrological traceability of the measurements of gaseous atmospheric pollutants, in particular of carbon dioxide (CO 2 ), is presented. Two primary methods, the gravimetry and the dynamic dilution, are used for the preparation of reference standards for composition which can be used to calibrate sensors and analytical instrumentation. At present, research is carried out to lower the measurement uncertainties of the primary gas mixtures and to extend their application to the oceanic field. The reason of such investigation is due to the evidence of the changes occurring in seawater carbonate chemistry, connected to the rising level of CO 2 in the atmosphere. The well established activity to assure the metrological traceability of CO 2 in the atmosphere will be applied to the determination of CO 2 in seawater, by developing suitable reference materials for calibration and control of the sensors during their routine use. (paper)

Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad

Energy Technology Data Exchange (ETDEWEB)

Alcock, Simon G., E-mail: simon.alcock@diamond.ac.uk; Nistea, Ioana; Sawhney, Kawal [Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire OX11 0DE (United Kingdom)

2016-05-15

We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM’s autocollimator adds into the overall measured value of the mirror’s slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad

International Nuclear Information System (INIS)

Alcock, Simon G.; Nistea, Ioana; Sawhney, Kawal

2016-01-01

We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM’s autocollimator adds into the overall measured value of the mirror’s slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad.

Science.gov (United States)

Alcock, Simon G; Nistea, Ioana; Sawhney, Kawal

2016-05-01

We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM's autocollimator adds into the overall measured value of the mirror's slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

Quantifying Human Response: Linking metrological and psychometric characterisations of Man as a Measurement Instrument

International Nuclear Information System (INIS)

Pendrill, L R; Fisher, William P Jr

2013-01-01

A better understanding of how to characterise human response is essential to improved person-centred care and other situations where human factors are crucial. Challenges to introducing classical metrological concepts such as measurement uncertainty and traceability when characterising Man as a Measurement Instrument include the failure of many statistical tools when applied to ordinal measurement scales and a lack of metrological references in, for instance, healthcare. The present work attempts to link metrological and psychometric (Rasch) characterisation of Man as a Measurement Instrument in a study of elementary tasks, such as counting dots, where one knows independently the expected value because the measurement object (collection of dots) is prepared in advance. The analysis is compared and contrasted with recent approaches to this problem by others, for instance using signal error fidelity

Dynamic Length Metrology (DLM) for measurements with sub-micrometre uncertainty in a production environment

DEFF Research Database (Denmark)

De Chiffre, Leonardo; Hansen, Hans Nørgaard; Hattel, Jesper Henri

2016-01-01

Conventional length metrology for traceable accurate measurements requires costly temperature controlled facilities, long waiting time for part acclimatisation, and separate part material characterisation. This work describes a method called Dynamic Length Metrology (DLM) developed to achieve sub...

Relativistic quantum metrology: exploiting relativity to improve quantum measurement technologies.

Science.gov (United States)

Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

2014-05-22

We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects.

Detecting metrologically useful asymmetry and entanglement by a few local measurements

Science.gov (United States)

Zhang, Chao; Yadin, Benjamin; Hou, Zhi-Bo; Cao, Huan; Liu, Bi-Heng; Huang, Yun-Feng; Maity, Reevu; Vedral, Vlatko; Li, Chuan-Feng; Guo, Guang-Can; Girolami, Davide

2017-10-01

Important properties of a quantum system are not directly measurable, but they can be disclosed by how fast the system changes under controlled perturbations. In particular, asymmetry and entanglement can be verified by reconstructing the state of a quantum system. Yet, this usually requires experimental and computational resources which increase exponentially with the system size. Here we show how to detect metrologically useful asymmetry and entanglement by a limited number of measurements. This is achieved by studying how they affect the speed of evolution of a system under a unitary transformation. We show that the speed of multiqubit systems can be evaluated by measuring a set of local observables, providing exponential advantage with respect to state tomography. Indeed, the presented method requires neither the knowledge of the state and the parameter-encoding Hamiltonian nor global measurements performed on all the constituent subsystems. We implement the detection scheme in an all-optical experiment.

Virtual Distances Methodology as Verification Technique for AACMMs with a Capacitive Sensor Based Indexed Metrology Platform

Science.gov (United States)

Acero, Raquel; Santolaria, Jorge; Brau, Agustin; Pueo, Marcos

2016-01-01

This paper presents a new verification procedure for articulated arm coordinate measuring machines (AACMMs) together with a capacitive sensor-based indexed metrology platform (IMP) based on the generation of virtual reference distances. The novelty of this procedure lays on the possibility of creating virtual points, virtual gauges and virtual distances through the indexed metrology platform’s mathematical model taking as a reference the measurements of a ball bar gauge located in a fixed position of the instrument’s working volume. The measurements are carried out with the AACMM assembled on the IMP from the six rotating positions of the platform. In this way, an unlimited number and types of reference distances could be created without the need of using a physical gauge, therefore optimizing the testing time, the number of gauge positions and the space needed in the calibration and verification procedures. Four evaluation methods are presented to assess the volumetric performance of the AACMM. The results obtained proved the suitability of the virtual distances methodology as an alternative procedure for verification of AACMMs using the indexed metrology platform. PMID:27869722

Virtual Distances Methodology as Verification Technique for AACMMs with a Capacitive Sensor Based Indexed Metrology Platform.

Science.gov (United States)

Acero, Raquel; Santolaria, Jorge; Brau, Agustin; Pueo, Marcos

2016-11-18

This paper presents a new verification procedure for articulated arm coordinate measuring machines (AACMMs) together with a capacitive sensor-based indexed metrology platform (IMP) based on the generation of virtual reference distances. The novelty of this procedure lays on the possibility of creating virtual points, virtual gauges and virtual distances through the indexed metrology platform's mathematical model taking as a reference the measurements of a ball bar gauge located in a fixed position of the instrument's working volume. The measurements are carried out with the AACMM assembled on the IMP from the six rotating positions of the platform. In this way, an unlimited number and types of reference distances could be created without the need of using a physical gauge, therefore optimizing the testing time, the number of gauge positions and the space needed in the calibration and verification procedures. Four evaluation methods are presented to assess the volumetric performance of the AACMM. The results obtained proved the suitability of the virtual distances methodology as an alternative procedure for verification of AACMMs using the indexed metrology platform.

A laser metrology/viewing system for ITER in-vessel inspection

International Nuclear Information System (INIS)

Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Herndon, J.N.; Menon, M.M.; Slotwinski, A.; Dagher, M.A.; Yuen, J.L.

1998-01-01

This paper identifies the requirements for the International Thermonuclear Experimental Reactor metrology and viewing system, and describes a remotely operated precision surface mapping system. A metrology system capable of achieving sub-millimeter accuracy must operate in a reactor vessel that has high gamma radiation, high vacuum, elevated temperature, and magnetic field. A coherent, frequency modulated laser radar system is under development to meet these requirements. The metrology/viewing sensor consists of a compact laser optics module linked through fiber optics to the laser source and imaging units, located outside the harsh environment. The deployment mechanism is a remotely operated telescopic-mast. Gamma irradiation to 10 7 Gy was conducted on critical sensor components at Oak Ridge National Laboratory, with no significant impact to data transmission, and analysis indicates that critical sensor components can operate in a magnetic field with certain design modifications. Plans for testing key components in a magnetic field are underway. (orig.)

LISA Pathfinder: Optical Metrology System monitoring during operations

Science.gov (United States)

Audley, Heather E.; LISA Pathfinder Collaboration

2017-05-01

The LISA Pathfinder (LPF) mission has demonstrated excellent performance. In addition to having surpassed the main mission goals, data has been collected from the various subsystems throughout the duration of the mission. This data is a valuable resource, both for a more complete understanding of the LPF satellite and the differential acceleration measurements, as well as for the design of the future Laser Interferometer Space Antenna (LISA) mission. Initial analysis of the Optical Metrology System (OMS) data was performed as part of daily system monitoring, and more in-depth analyses are ongoing. This contribution presents an overview of these activities along with an introduction to the OMS.

Clean focus, dose and CD metrology for CD uniformity improvement

Science.gov (United States)

Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Kim, Nakyoon; Robinson, John C.; Mengel, Markus; Pablo, Rovira; Yoo, Sungchul; Getin, Raphael; Choi, Dongsub; Jeon, Sanghuck

2018-03-01

Lithography process control solutions require more exacting capabilities as the semiconductor industry goes forward to the 1x nm node DRAM device manufacturing. In order to continue scaling down the device feature sizes, critical dimension (CD) uniformity requires continuous improvement to meet the required CD error budget. In this study we investigate using optical measurement technology to improve over CD-SEM methods in focus, dose, and CD. One of the key challenges is measuring scanner focus of device patterns. There are focus measurement methods based on specially designed marks on scribe-line, however, one issue of this approach is that it will report focus of scribe line which is potentially different from that of the real device pattern. In addition, scribe-line marks require additional design and troubleshooting steps that add complexity. In this study, we investigated focus measurement directly on the device pattern. Dose control is typically based on using the linear correlation behavior between dose and CD. The noise of CD measurement, based on CD-SEM for example, will not only impact the accuracy, but also will make it difficult to monitor dose signature on product wafers. In this study we will report the direct dose metrology result using an optical metrology system which especially enhances the DUV spectral coverage to improve the signal to noise ratio. CD-SEM is often used to measure CD after the lithography step. This measurement approach has the advantage of easy recipe setup as well as the flexibility to measure critical feature dimensions, however, we observe that CD-SEM metrology has limitations. In this study, we demonstrate within-field CD uniformity improvement through the extraction of clean scanner slit and scan CD behavior by using optical metrology.

Remote metrology system (RMS) design concept

Energy Technology Data Exchange (ETDEWEB)

NONE

1995-10-19

A 3D remote metrology system (RMS) is needed to map the interior plasma-facing components of the International Thermonuclear Experimental Reactor (ITER). The performance and survival of these components within the reactor vessel are strongly dependent on their precise alignment and positioning with respect to the plasma edge. Without proper positioning and alignment, plasma-facing surfaces will erode rapidly. A RMS design involving Coleman Research Corporation (CRC) fiber optic coherent laser radar (CLR) technology is examined in this study. The fiber optic CLR approach was selected because its high precision should be able to meet the ITER 0.1 mm accuracy requirement and because the CLR`s fiber optic implementation allows a 3D scanner to operate remotely from the RMS system`s vulnerable components. This design study has largely verified that a fiber optic CLR based RMS can survive the ITER environment and map the ITER interior at the required accuracy at a one measurement/cm{sup 2} density with a total measurement time of less than one hour from each of six or more vertically deployed measurement probes. The design approach employs a sealed and pressurized measurement probe which is attached with an umbilical spiral bellows conduit. This conduit bears fiber optic and electronic links plus a stream of air to lower the temperature in the interior of the probe. Lowering the probe temperature is desirable because probe electromechanical components which could survive the radiation environment often were not rated for the 200 C temperature. The tip of the probe whose outer shell has a flexible bellows joint can swivel in two degrees of freedom to allow mapping operations at each probe deployment level. This design study has concluded that the most successful scanner design will involve a hybrid AO beam deflector and mechanical scanner.

Introduction to quantum metrology quantum standards and instrumentation

CERN Document Server

Nawrocki, Waldemar

2015-01-01

This book presents the theory of quantum effects used in metrology and results of the author’s own research in the field of quantum electronics. The book provides also quantum measurement standards used in many branches of metrology for electrical quantities, mass, length, time and frequency. This book represents the first comprehensive survey of quantum metrology problems. As a scientific survey, it propagates a new approach to metrology with more emphasis on its connection with physics. This is of importance for the constantly developing technologies and nanotechnologies in particular. Providing a presentation of practical applications of the effects used in quantum metrology for the construction of quantum standards and sensitive electronic components, the book is useful for a wide audience of physicists and metrologists in the broad sense of both terms. In 2014 a new system of units, the so called  Quantum SI, is introduced. This book helps to understand and approve the new system to both technology a...

64nm pitch metal1 double patterning metrology: CD and OVL control by SEMCD, image based overlay and diffraction based overlay

Science.gov (United States)

Ducoté, Julien; Dettoni, Florent; Bouyssou, Régis; Le-Gratiet, Bertrand; Carau, Damien; Dezauzier, Christophe

2015-03-01

Patterning process control of advanced nodes has required major changes over the last few years. Process control needs of critical patterning levels since 28nm technology node is extremely aggressive showing that metrology accuracy/sensitivity must be finely tuned. The introduction of pitch splitting (Litho-Etch-Litho-Etch) at 14FDSOInm node requires the development of specific metrologies to adopt advanced process control (for CD, overlay and focus corrections). The pitch splitting process leads to final line CD uniformities that are a combination of the CD uniformities of the two exposures, while the space CD uniformities are depending on both CD and OVL variability. In this paper, investigations of CD and OVL process control of 64nm minimum pitch at Metal1 level of 14FDSOI technology, within the double patterning process flow (Litho, hard mask etch, line etch) are presented. Various measurements with SEMCD tools (Hitachi), and overlay tools (KT for Image Based Overlay - IBO, and ASML for Diffraction Based Overlay - DBO) are compared. Metrology targets are embedded within a block instanced several times within the field to perform intra-field process variations characterizations. Specific SEMCD targets were designed for independent measurement of both line CD (A and B) and space CD (A to B and B to A) for each exposure within a single measurement during the DP flow. Based on those measurements correlation between overlay determined with SEMCD and with standard overlay tools can be evaluated. Such correlation at different steps through the DP flow is investigated regarding the metrology type. Process correction models are evaluated with respect to the measurement type and the intra-field sampling.

Metrology and ionospheric observation standards

Science.gov (United States)

Panshin, Evgeniy; Minligareev, Vladimir; Pronin, Anton

Accuracy and ionospheric observation validity are urgent trends nowadays. WMO, URSI and national metrological and standardisation services bring forward requirements and descriptions of the ionospheric observation means. Researches in the sphere of metrological and standardisation observation moved to the next level in the Russian Federation. Fedorov Institute of Applied Geophysics (IAG) is in charge of ionospheric observation in the Russian Federation and the National Technical Committee, TC-101 , which was set up on the base of IAG- of the standardisation in the sphere. TC-101 can be the platform for initiation of the core international committee in the network of ISO The new type of the ionosounde “Parus-A” is engineered, which is up to the national requirements. “Parus-A” calibration and test were conducted by National metrological Institute (NMI) -D.I. Mendeleyev Institute for Metrology (VNIIM), signed CIMP MRA in 1991. VNIIM is a basic NMI in the sphere of Space weather (including ionospheric observations), the founder of which was celebrated chemist and metrologist Dmitriy I. Mendeleyev. Tests and calibration were carried out for the 1st time throughout 50-year-history of ionosonde exploitation in Russia. The following metrological characteristics were tested: -measurement range of radiofrequency time delay 0.5-10 ms; -time measurement inaccuracy of radio- frequency pulse ±12mcs; -frequency range of radio impulse 1-20 MHz ; -measurement inaccuracy of radio impulse carrier frequency± 5KHz. For example, the sound impulse simulator that was built-in in the ionosounde was used for measurement range of radiofrequency time delay testing. The number of standards on different levels is developed. - “Ionospheric observation guidance”; - “The Earth ionosphere. Terms and definitions”.

Efficiency improvements of offline metrology job creation

Science.gov (United States)

Zuniga, Victor J.; Carlson, Alan; Podlesny, John C.; Knutrud, Paul C.

1999-06-01

Progress of the first lot of a new design through the production line is watched very closely. All performance metrics, cycle-time, in-line measurement results and final electrical performance are critical. Rapid movement of this lot through the line has serious time-to-market implications. Having this material waiting at a metrology operation for an engineer to create a measurement job plan wastes valuable turnaround time. Further, efficient use of a metrology system is compromised by the time required to create and maintain these measurement job plans. Thus, having a method to develop metrology job plans prior to the actual running of the material through the manufacture area can significantly improve both cycle time and overall equipment efficiency. Motorola and Schlumberger have worked together to develop and test such a system. The Remote Job Generator (RJG) created job plans for new device sin a manufacturing process from an NT host or workstation, offline. This increases available system tim effort making production measurements, decreases turnaround time on job plan creation and editing, and improves consistency across job plans. Most importantly this allows job plans for new devices to be available before the first wafers of the device arrive at the tool for measurement. The software also includes a database manager which allows updates of existing job plans to incorporate measurement changes required by process changes or measurement optimization. This paper will review the result of productivity enhancements through the increased metrology utilization and decreased cycle time associated with the use of RJG. Finally, improvements in process control through better control of Job Plans across different devices and layers will be discussed.

Process and system - A dual definition, revisited with consequences in metrology

Science.gov (United States)

Ruhm, K. H.

2010-07-01

Lets assert that metrology life could be easier scientifically as well as technologically, if we, intentionally, would make an explicit distinction between two outstanding domains, namely the given, really existent domain of processes and the just virtually existent domain of systems, the latter of which is designed and used by the human mind. The abstract domain of models, by which we map the manifold reality of processes, is itself part of the domain of systems. Models support comprehension and communication, although they are normally extreme simplifications of properties and behaviour of a concrete reality. So, systems and signals represent processes and quantities, which are described by means of Signal and System Theory as well as by Stochastics and Statistics. The following presentation of this new, demanding and somehow irritating definition of the terms process and system as a dual pair is unusual indeed, but it opens the door widely to a better and more consistent discussion and understanding of manifold scientific tools in many areas. Metrology [4] is one of the important fields of concern due to many reasons: One group of the soft and hard links between the domain of processes and the domain of systems is realised by concepts of measurement science on the one hand and by instrumental tools of measurement technology on the other hand.

High pressure metrology for industrial applications

Science.gov (United States)

Sabuga, Wladimir; Rabault, Thierry; Wüthrich, Christian; Pražák, Dominik; Chytil, Miroslav; Brouwer, Ludwig; Ahmed, Ahmed D. S.

2017-12-01

To meet the needs of industries using high pressure technologies, in traceable, reliable and accurate pressure measurements, a joint research project of the five national metrology institutes and the university was carried out within the European Metrology Research Programme. In particular, finite element methods were established for stress-strain analysis of elastic and nonlinear elastic-plastic deformation, as well as of contact processes in pressure-measuring piston-cylinder assemblies, and high-pressure components at pressures above 1 GPa. New pressure measuring multipliers were developed and characterised, which allow realisation of the pressure scale up to 1.6 GPa. This characterisation is based on research including measurements of material elastic constants by the resonant ultrasound spectroscopy, hardness of materials of high pressure components, density and viscosity of pressure transmitting liquids at pressures up to 1.4 GPa and dimensional measurements on piston-cylinders. A 1.6 GPa pressure system was created for operation of the 1.6 GPa multipliers and calibration of high pressure transducers. A transfer standard for 1.5 GPa pressure range, based on pressure transducers, was built and tested. Herewith, the project developed the capability of measuring pressures up to 1.6 GPa, from which industrial users can calibrate their pressure measurement devices for accurate measurements up to 1.5 GPa.

Measurement range of phase retrieval in optical surface and wavefront metrology

International Nuclear Information System (INIS)

Brady, Gregory R.; Fienup, James R.

2009-01-01

Phase retrieval employs very simple data collection hardware and iterative algorithms to determine the phase of an optical field. We have derived limitations on phase retrieval, as applied to optical surface and wavefront metrology, in terms of the speed of beam (i.e., f-number or numerical aperture) and amount of aberration using arguments based on sampling theory and geometrical optics. These limitations suggest methodologies for expanding these ranges by increasing the complexity of the measurement arrangement, the phase-retrieval algorithm, or both. We have simulated one of these methods where a surface is measured at unusual conjugates

Metrological large range scanning probe microscope

International Nuclear Information System (INIS)

Dai Gaoliang; Pohlenz, Frank; Danzebrink, Hans-Ulrich; Xu Min; Hasche, Klaus; Wilkening, Guenter

2004-01-01

We describe a metrological large range scanning probe microscope (LR-SPM) with an Abbe error free design and direct interferometric position measurement capability, aimed at versatile traceable topographic measurements that require nanometer accuracy. A dual-stage positioning system was designed to achieve both a large measurement range and a high measurement speed. This dual-stage system consists of a commercially available stage, referred to as nanomeasuring machine (NMM), with a motion range of 25 mmx25 mmx5 mm along x, y, and z axes, and a compact z-axis piezoelectric positioning stage (compact z stage) with an extension range of 2 μm. The metrological LR-SPM described here senses the surface using a stationary fixed scanning force microscope (SFM) head working in contact mode. During operation, lateral scanning of the sample is performed solely by the NMM. Whereas the z motion, controlled by the SFM signal, is carried out by a combination of the NMM and the compact z stage. In this case the compact z stage, with its high mechanical resonance frequency (greater than 20 kHz), is responsible for the rapid motion while the NMM simultaneously makes slower movements over a larger motion range. To reduce the Abbe offset to a minimum the SFM tip is located at the intersection of three interferometer measurement beams orientated in x, y, and z directions. To improve real time performance two high-end digital signal processing (DSP) systems are used for NMM positioning and SFM servocontrol. Comprehensive DSP firmware and Windows XP-based software are implemented, providing a flexible and user-friendly interface. The instrument is able to perform large area imaging or profile scanning directly without stitching small scanned images. Several measurements on different samples such as flatness standards, nanostep height standards, roughness standards as well as sharp nanoedge samples and 1D gratings demonstrate the outstanding metrological capabilities of the instrument

Improving OCD time to solution using Signal Response Metrology

Science.gov (United States)

Fang, Fang; Zhang, Xiaoxiao; Vaid, Alok; Pandev, Stilian; Sanko, Dimitry; Ramanathan, Vidya; Venkataraman, Kartik; Haupt, Ronny

2016-03-01

In recent technology nodes, advanced process and novel integration scheme have challenged the precision limits of conventional metrology; with critical dimensions (CD) of device reduce to sub-nanometer region. Optical metrology has proved its capability to precisely detect intricate details on the complex structures, however, conventional RCWA-based (rigorous coupled wave analysis) scatterometry has the limitations of long time-to-results and lack of flexibility to adapt to wide process variations. Signal Response Metrology (SRM) is a new metrology technique targeted to alleviate the consumption of engineering and computation resources by eliminating geometric/dispersion modeling and spectral simulation from the workflow. This is achieved by directly correlating the spectra acquired from a set of wafers with known process variations encoded. In SPIE 2015, we presented the results of SRM application in lithography metrology and control [1], accomplished the mission of setting up a new measurement recipe of focus/dose monitoring in hours. This work will demonstrate our recent field exploration of SRM implementation in 20nm technology and beyond, including focus metrology for scanner control; post etch geometric profile measurement, and actual device profile metrology.

Realizing "value-added" metrology

Science.gov (United States)

Bunday, Benjamin; Lipscomb, Pete; Allgair, John; Patel, Dilip; Caldwell, Mark; Solecky, Eric; Archie, Chas; Morningstar, Jennifer; Rice, Bryan J.; Singh, Bhanwar; Cain, Jason; Emami, Iraj; Banke, Bill, Jr.; Herrera, Alfredo; Ukraintsev, Vladamir; Schlessinger, Jerry; Ritchison, Jeff

2007-03-01

The conventional premise that metrology is a "non-value-added necessary evil" is a misleading and dangerous assertion, which must be viewed as obsolete thinking. Many metrology applications are key enablers to traditionally labeled "value-added" processing steps in lithography and etch, such that they can be considered integral parts of the processes. Various key trends in modern, state-of-the-art processing such as optical proximity correction (OPC), design for manufacturability (DFM), and advanced process control (APC) are based, at their hearts, on the assumption of fine-tuned metrology, in terms of uncertainty and accuracy. These trends are vehicles where metrology thus has large opportunities to create value through the engineering of tight and targetable process distributions. Such distributions make possible predictability in speed-sorts and in other parameters, which results in high-end product. Additionally, significant reliance has also been placed on defect metrology to predict, improve, and reduce yield variability. The necessary quality metrology is strongly influenced by not only the choice of equipment, but also the quality application of these tools in a production environment. The ultimate value added by metrology is a result of quality tools run by a quality metrology team using quality practices. This paper will explore the relationships among present and future trends and challenges in metrology, including equipment, key applications, and metrology deployment in the manufacturing flow. Of key importance are metrology personnel, with their expertise, practices, and metrics in achieving and maintaining the required level of metrology performance, including where precision, matching, and accuracy fit into these considerations. The value of metrology will be demonstrated to have shifted to "key enabler of large revenues," debunking the out-of-date premise that metrology is "non-value-added." Examples used will be from critical dimension (CD

Flexible resources for quantum metrology

Science.gov (United States)

Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J.; Dür, Wolfgang

2017-06-01

Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement.

Flexible resources for quantum metrology

International Nuclear Information System (INIS)

Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J; Dür, Wolfgang

2017-01-01

Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement. (paper)

A Century of Acoustic Metrology

DEFF Research Database (Denmark)

Rasmussen, Knud

1998-01-01

The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect.......The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect....

Integration of mask and silicon metrology in DFM

Science.gov (United States)

Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

2009-03-01

We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based

Improving the surface metrology accuracy of optical profilers by using multiple measurements

Science.gov (United States)

Xu, Xudong; Huang, Qiushi; Shen, Zhengxiang; Wang, Zhanshan

2016-10-01

The performance of high-resolution optical systems is affected by small angle scattering at the mid-spatial-frequency irregularities of the optical surface. Characterizing these irregularities is, therefore, important. However, surface measurements obtained with optical profilers are influenced by additive white noise, as indicated by the heavy-tail effect observable on their power spectral density (PSD). A multiple-measurement method is used to reduce the effects of white noise by averaging individual measurements. The intensity of white noise is determined using a model based on the theoretical PSD of fractal surface measurements with additive white noise. The intensity of white noise decreases as the number of times of multiple measurements increases. Using multiple measurements also increases the highest observed spatial frequency; this increase is derived and calculated. Additionally, the accuracy obtained using multiple measurements is carefully studied, with the analysis of both the residual reference error after calibration, and the random errors appearing in the range of measured spatial frequencies. The resulting insights on the effects of white noise in optical profiler measurements and the methods to mitigate them may prove invaluable to improve the quality of surface metrology with optical profilers.

SIP-Based Single Neuron Stochastic Predictive Control for Non-Gaussian Networked Control Systems with Uncertain Metrology Delays

Directory of Open Access Journals (Sweden)

Xinying Xu

2018-06-01

Full Text Available In this paper, a novel data-driven single neuron predictive control strategy is proposed for non-Gaussian networked control systems with metrology delays in the information theory framework. Firstly, survival information potential (SIP, instead of minimum entropy, is used to formulate the performance index to characterize the randomness of the considered systems, which is calculated by oversampling method. Then the minimum values can be computed by optimizing the SIP-based performance index. Finally, the proposed strategy, minimum entropy method and mean square error (MSE are applied to a networked motor control system, and results demonstrated the effectiveness of the proposed strategy.

Remote metrology system (RMS) design concept

International Nuclear Information System (INIS)

1995-01-01

A 3D remote metrology system (RMS) is needed to map the interior plasma-facing components of the International Thermonuclear Experimental Reactor (ITER). The performance and survival of these components within the reactor vessel are strongly dependent on their precise alignment and positioning with respect to the plasma edge. Without proper positioning and alignment, plasma-facing surfaces will erode rapidly. A RMS design involving Coleman Research Corporation (CRC) fiber optic coherent laser radar (CLR) technology is examined in this study. The fiber optic CLR approach was selected because its high precision should be able to meet the ITER 0.1 mm accuracy requirement and because the CLR's fiber optic implementation allows a 3D scanner to operate remotely from the RMS system's vulnerable components. This design study has largely verified that a fiber optic CLR based RMS can survive the ITER environment and map the ITER interior at the required accuracy at a one measurement/cm 2 density with a total measurement time of less than one hour from each of six or more vertically deployed measurement probes. The design approach employs a sealed and pressurized measurement probe which is attached with an umbilical spiral bellows conduit. This conduit bears fiber optic and electronic links plus a stream of air to lower the temperature in the interior of the probe. Lowering the probe temperature is desirable because probe electromechanical components which could survive the radiation environment often were not rated for the 200 C temperature. The tip of the probe whose outer shell has a flexible bellows joint can swivel in two degrees of freedom to allow mapping operations at each probe deployment level. This design study has concluded that the most successful scanner design will involve a hybrid AO beam deflector and mechanical scanner

Overlay metrology for double patterning processes

Science.gov (United States)

Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej

2009-03-01

The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double

Chemical metrology, strategic job for the Chilean Nuclear Energy Commission

International Nuclear Information System (INIS)

Gras, Nuri; Munoz, Luis; Cortes, Eduardo

2001-01-01

The National Standardization Institute's (INN) Metrology unit prepared a study in 1996 to evaluate the impact of metrological activity in Chile. This study was based on a survey of the supply and demand of metrological services and on studies of the behavior of the production system and technological services in Chile during the period 1990-1996. With the information obtained in this study the economic impact resulting from the lack of a national metrology system could be evaluated. This impact was estimated to be a 5% loss in gross national product equal to 125-500 million dollars because of direct product rejection in the mining, fisheries, agricultural and manufacturing sectors. Chemical measurements are responsible for 50% of these losses. In response to this need and coordinated by the INN, a metrological network of reference laboratories began to operate in 1997 for the principal physical magnitudes (mass, temperature, longitude and force) and a CORFO-FDI project began in 2001 that includes the chemical magnitudes. The Chilean Nuclear Energy Commission, aware of the problem's importance and the amount of economic damage that the country may suffer, as a result of these deficiencies, has formed a Chemical Metrology Unit to provide technical support. It aims to raise the standards of local analytical laboratories by providing international recognition to the export sector. Nuclear analytical techniques are used as reference methods. This work describes the laboratories that are included in this Chemical Metrology Unit and the historical contribution to the development of local analytical chemistry. The national and international projects are described together with the publications they have generated. The quality assurance program applied to the laboratories is described as well, which has led to the accreditation of the analytical chemical assays. The procedures used for validation and calculation of uncertain nuclear methodologies are described together with

FPGA-Based Smart Sensor for Online Displacement Measurements Using a Heterodyne Interferometer

Science.gov (United States)

Vera-Salas, Luis Alberto; Moreno-Tapia, Sandra Veronica; Garcia-Perez, Arturo; de Jesus Romero-Troncoso, Rene; Osornio-Rios, Roque Alfredo; Serroukh, Ibrahim; Cabal-Yepez, Eduardo

2011-01-01

The measurement of small displacements on the nanometric scale demands metrological systems of high accuracy and precision. In this context, interferometer-based displacement measurements have become the main tools used for traceable dimensional metrology. The different industrial applications in which small displacement measurements are employed requires the use of online measurements, high speed processes, open architecture control systems, as well as good adaptability to specific process conditions. The main contribution of this work is the development of a smart sensor for large displacement measurement based on phase measurement which achieves high accuracy and resolution, designed to be used with a commercial heterodyne interferometer. The system is based on a low-cost Field Programmable Gate Array (FPGA) allowing the integration of several functions in a single portable device. This system is optimal for high speed applications where online measurement is needed and the reconfigurability feature allows the addition of different modules for error compensation, as might be required by a specific application. PMID:22164040

Optical metrology alignment and impact on the measurement performance of the LISA Technology Package

Energy Technology Data Exchange (ETDEWEB)

Hirth, M; Fichter, W; Brandt, N; Gerardi, D [iFR, Universitaet Stuttgart, Pfaffenwaldring 7a, 70569 Stuttgart (Germany); Schleicher, A [Astrium GmbH, 88039 Friedrichshafen (Germany); Wanner, G, E-mail: marc.hirth@ifr.uni-stuttgart.d [Albert Einstein Institut, Callinstrasse 38, 30167 Hannover (Germany)

2009-03-01

Aside from LISA Pathfinder's top-level acceleration requirement, there is a stringent independent requirement for the accuracy of the optical metrology system. In case of a perfectly aligned metrology system (optical bench and test masses) it should rather be independent of residual displacement jitter due to control. However, this ideal case will not be achieved as mechanical tolerances and uncertainties lead to a direct impact of test mass and spacecraft displacement jitter on the optical measurement accuracy. In this paper, we present a strategy how to cover these effects for a systematic requirement breakdown. We use a simplified nonlinear geometrical model for the differential distance measurement of the test masses which is linearized and linked to the equations of motion for both the spacecraft and the two test masses. This leads from test mass relative displacement to a formulation in terms of applied force/torque and thus allows to distinguish the absolute motion of each of the three bodies. It further shows how motions in each degree of freedom couple linearly into the optical measurement via DC misalignments of the laser beam and the test masses. This finally allows for deriving requirements on the alignment accuracy of components and on permittable closed-loop acceleration noise. In the last part a budget for the expected measurement performance is compiled from simulations as no measurement data is available yet.

Optical metrology alignment and impact on the measurement performance of the LISA Technology Package

International Nuclear Information System (INIS)

Hirth, M; Fichter, W; Brandt, N; Gerardi, D; Schleicher, A; Wanner, G

2009-01-01

Aside from LISA Pathfinder's top-level acceleration requirement, there is a stringent independent requirement for the accuracy of the optical metrology system. In case of a perfectly aligned metrology system (optical bench and test masses) it should rather be independent of residual displacement jitter due to control. However, this ideal case will not be achieved as mechanical tolerances and uncertainties lead to a direct impact of test mass and spacecraft displacement jitter on the optical measurement accuracy. In this paper, we present a strategy how to cover these effects for a systematic requirement breakdown. We use a simplified nonlinear geometrical model for the differential distance measurement of the test masses which is linearized and linked to the equations of motion for both the spacecraft and the two test masses. This leads from test mass relative displacement to a formulation in terms of applied force/torque and thus allows to distinguish the absolute motion of each of the three bodies. It further shows how motions in each degree of freedom couple linearly into the optical measurement via DC misalignments of the laser beam and the test masses. This finally allows for deriving requirements on the alignment accuracy of components and on permittable closed-loop acceleration noise. In the last part a budget for the expected measurement performance is compiled from simulations as no measurement data is available yet.

Development of ITER in-vessel viewing and metrology systems

Energy Technology Data Exchange (ETDEWEB)

Obara, Kenjiro; Kakudate, Satoshi; Nakahira, Masataka; Ito, Akira [Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan). Tokai Research Establishment

1998-04-01

The ITER in-vessel viewing system is vital for detecting and locating damage to in-vessel components such as the blankets and divertors and in monitoring and assisting in-vessel maintenance. This system must be able to operate at high temperature (200degC) under intense gamma radiation ({approx}30 kGy/h) in a high vacuum or 1 bar inert gas. A periscope viewing system was chosen as a reference due to its clear, wide view and a fiberscope viewing system chosen as a backup for viewing in narrow confines. According to the ITER R and D program, both systems and a metrology system are being developed through the joint efforts of Japan, the U.S., and RF Home Teams. This paper outlines design and technology development mainly on periscope in-vessel viewing and laser metrology contributed by the Japan Home Team. (author)

Development of ITER in-vessel viewing and metrology systems

International Nuclear Information System (INIS)

Obara, Kenjiro; Kakudate, Satoshi; Nakahira, Masataka; Ito, Akira

1998-01-01

The ITER in-vessel viewing system is vital for detecting and locating damage to in-vessel components such as the blankets and divertors and in monitoring and assisting in-vessel maintenance. This system must be able to operate at high temperature (200degC) under intense gamma radiation (∼30 kGy/h) in a high vacuum or 1 bar inert gas. A periscope viewing system was chosen as a reference due to its clear, wide view and a fiberscope viewing system chosen as a backup for viewing in narrow confines. According to the ITER R and D program, both systems and a metrology system are being developed through the joint efforts of Japan, the U.S., and RF Home Teams. This paper outlines design and technology development mainly on periscope in-vessel viewing and laser metrology contributed by the Japan Home Team. (author)

Coherent double-color interference microscope for traceable optical surface metrology

Science.gov (United States)

Malinovski, I.; França, R. S.; Bessa, M. S.; Silva, C. R.; Couceiro, I. B.

2016-06-01

Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed.

Coherent double-color interference microscope for traceable optical surface metrology

International Nuclear Information System (INIS)

Malinovski, I; França, R S; Bessa, M S; Silva, C R; Couceiro, I B

2016-01-01

Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed. (paper)

EMRP JRP MetNH3: Towards a Consistent Metrological Infrastructure for Ammonia Measurements in Ambient Air

Science.gov (United States)

Leuenberger, Daiana; Balslev-Harder, David; Braban, Christine F.; Ebert, Volker; Ferracci, Valerio; Gieseking, Bjoern; Hieta, Tuomas; Martin, Nicholas A.; Pascale, Céline; Pogány, Andrea; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

2016-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. In addition to its acidifying effect on natural waters and soils and to the additional nitrogen input to ecosystems, ammonia is an important precursor for secondary aerosol formation in the atmosphere. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation regarding certified reference material (CRM), applicable analytical methods, measurement uncertainty, quality assurance and quality control (QC/QA) procedures as well as in the infrastructure to attain metrological traceability. As shown in a key comparison in 2007, there are even discrepancies between reference materials provided by European National Metrology Institutes (NMIs) at amount fraction levels up to three orders of magnitude higher than ambient air levels. MetNH3 (Metrology for ammonia in ambient air), a three-year project that started in June 2014 in the framework of the European Metrology Research Programme (EMRP), aims to reduce the gap between requirements set by the European emission regulations and state-of-the-art of analytical methods and reference materials. The overarching objective of the JRP is to achieve metrological traceability for ammonia measurements in ambient air from primary certified reference material CRM and instrumental standards to the field level. This requires the successful completion of the three main goals, which have been assigned to three technical work packages: To develop improved reference gas mixtures by static and dynamic gravimetric generation methods Realisation and characterisation of traceable preparative calibration standards (in pressurised cylinders as well as mobile generators) of ammonia amount fractions similar to those in ambient air based on existing methods for other reactive analytes. The

Optical vortex metrology: Are phase singularities foes or friends in optical metrology?

DEFF Research Database (Denmark)

Takeda, M.; Wang, W.; Hanson, Steen Grüner

2008-01-01

We raise an issue whether phase singularities are foes or friends in optical metrology, and give an answer by introducing the principle and applications of a new technique which we recently proposed for displacement and flow measurements. The technique is called optical vortex metrology because i...

Computed tomography for dimensional metrology

DEFF Research Database (Denmark)

Kruth, J.P.; Bartscher, M.; Carmignato, S.

2011-01-01

metrology, putting emphasis on issues as accuracy, traceability to the unit of length (the meter) and measurement uncertainty. It provides a state of the art (anno 2011) and application examples, showing the aptitude of CT metrology to: (i) check internal dimensions that cannot be measured using traditional...

Quality control of calibration system for area monitors at National Laboratory of Metrology from Ionizing Radiations (LNMRI)

International Nuclear Information System (INIS)

Ramos, M.M.O.; Freitas, L.C. de

1992-01-01

The quality control of equipment used in calibration from the National Laboratory of Metrology on Ionizing Radiations is presented, with results of standard measure systems and irradiation system. Tables and graphics with the quality of systems are also shown. (C.G.C.)

Radiation protection - quality and metrology

International Nuclear Information System (INIS)

Broutin, J.P.

2002-01-01

The radiation protection gathers three occupations: radiation protection agents; environment agents ( control and monitoring); metrology agents ( activities measurement and calibration). The quality and the metrology constitute a contribution in the technique competence and the guarantee of the service quality. This article, after a historical aspect of quality and metrology in France explains the advantages of such a policy. (N.C.)

UPWIND Metrology, Deliverable D 1A2.1, List of measurement Parameters

DEFF Research Database (Denmark)

Hansen, Kurt Schaldemose

performance measurements - Improvement of aerodynamic codes - Assessment of wind resources In general terms the uncertainty of the testing techniques and methods are typically much higher than the need. Since this problem covers many areas of wind energy, the work package is de-fined as a crosscutting...... activity. The problem is especially relevant for the following areas: Production related - Power performance testing especially in wind farms - Testing of turbine improvements in the order of several percent - Testing of aerodynamic codes - Testing of turbine response to effects such as turbulence...... profiles, turbulence, surface shear recovery distances etc) - Measurements of the interaction wind farms and microclimate The objectives of the metrology work package are to develop metrology tools in wind energy to significantly enhance the quality of measurement and testing techniques. The development...

Alanine-EPR dosimetry system for high industrial as well radiotherapeutic dose measurement

International Nuclear Information System (INIS)

Dobrovodsky, J.; Bukovjan, J.

2005-01-01

Slovak Institute of Metrology is developing new metrology standard for high doses, based on the alanine-EPR as a reference dosimetry system. A Bruker e-scan EPR analyser developed specifically for alanine dosimetry has improved stability of EPR measurement, especially at lower dose range. The standard e-scan system provides sensitivity below 1 Gray. After further improvement of the system and lowering of dose determination expanded uncertainty down below 1 %, its utilisation for radiotherapy field is expected (authors)

Present status of metrology of electro-optical surveillance systems

Science.gov (United States)

Chrzanowski, K.

2017-10-01

There has been a significant progress in equipment for testing electro-optical surveillance systems over the last decade. Modern test systems are increasingly computerized, employ advanced image processing and offer software support in measurement process. However, one great challenge, in form of relative low accuracy, still remains not solved. It is quite common that different test stations, when testing the same device, produce different results. It can even happen that two testing teams, while working on the same test station, with the same tested device, produce different results. Rapid growth of electro-optical technology, poor standardization, limited metrology infrastructure, subjective nature of some measurements, fundamental limitations from laws of physics, tendering rules and advances in artificial intelligence are major factors responsible for such situation. Regardless, next decade should bring significant improvements, since improvement in measurement accuracy is needed to sustain fast growth of electro-optical surveillance technology.

Nonlinear Quantum Metrology of Many-Body Open Systems

Science.gov (United States)

Beau, M.; del Campo, A.

2017-07-01

We introduce general bounds for the parameter estimation error in nonlinear quantum metrology of many-body open systems in the Markovian limit. Given a k -body Hamiltonian and p -body Lindblad operators, the estimation error of a Hamiltonian parameter using a Greenberger-Horne-Zeilinger state as a probe is shown to scale as N-[k -(p /2 )], surpassing the shot-noise limit for 2 k >p +1 . Metrology equivalence between initial product states and maximally entangled states is established for p ≥1 . We further show that one can estimate the system-environment coupling parameter with precision N-(p /2 ), while many-body decoherence enhances the precision to N-k in the noise-amplitude estimation of a fluctuating k -body Hamiltonian. For the long-range Ising model, we show that the precision of this parameter beats the shot-noise limit when the range of interactions is below a threshold value.

Coherent Laser Radar Metrology System for Large Scale Optical Systems, Phase II

Data.gov (United States)

National Aeronautics and Space Administration — A new type of laser radar metrology inspection system is proposed that incorporates a novel, dual laser coherent detection scheme capable of eliminating both...

Metrology and testing

International Nuclear Information System (INIS)

2010-01-01

The chapter presents the Metrology Service of Ionizing Radiation (SEMRI), the Metrology Service of Radioisotopes (SEMRA), the External Individual Monitoring Service (SEMEX), the Internal Individual Monitoring Service (SEMIN) and the associated laboratories, the analysis of environmental samples, system for management of quality from IRD and the National Program for intercomparison results of environmental samples analysis to radioisotopes determination

The correction of vibration in frequency scanning interferometry based absolute distance measurement system for dynamic measurements

Science.gov (United States)

Lu, Cheng; Liu, Guodong; Liu, Bingguo; Chen, Fengdong; Zhuang, Zhitao; Xu, Xinke; Gan, Yu

2015-10-01

Absolute distance measurement systems are of significant interest in the field of metrology, which could improve the manufacturing efficiency and accuracy of large assemblies in fields such as aircraft construction, automotive engineering, and the production of modern windmill blades. Frequency scanning interferometry demonstrates noticeable advantages as an absolute distance measurement system which has a high precision and doesn't depend on a cooperative target. In this paper , the influence of inevitable vibration in the frequency scanning interferometry based absolute distance measurement system is analyzed. The distance spectrum is broadened as the existence of Doppler effect caused by vibration, which will bring in a measurement error more than 103 times bigger than the changes of optical path difference. In order to decrease the influence of vibration, the changes of the optical path difference are monitored by a frequency stabilized laser, which runs parallel to the frequency scanning interferometry. The experiment has verified the effectiveness of this method.

STAT, GAPS, STRAIN, DRWDIM: a system of computer codes for analyzing HTGR fuel test element metrology data. User's manual

Energy Technology Data Exchange (ETDEWEB)

Saurwein, J.J.

1977-08-01

A system of computer codes has been developed to statistically reduce Peach Bottom fuel test element metrology data and to compare the material strains and fuel rod-fuel hole gaps computed from these data with HTGR design code predictions. The codes included in this system are STAT, STRAIN, GAPS, and DRWDIM. STAT statistically evaluates test element metrology data yielding fuel rod, fuel body, and sleeve irradiation-induced strains; fuel rod anisotropy; and additional data characterizing each analyzed fuel element. STRAIN compares test element fuel rod and fuel body irradiation-induced strains computed from metrology data with the corresponding design code predictions. GAPS compares test element fuel rod, fuel hole heat transfer gaps computed from metrology data with the corresponding design code predictions. DRWDIM plots the measured and predicted gaps and strains. Although specifically developed to expedite the analysis of Peach Bottom fuel test elements, this system can be applied, without extensive modification, to the analysis of Fort St. Vrain or other HTGR-type fuel test elements.

Laser source for dimensional metrology: investigation of an iodine stabilized system based on narrow linewidth 633 nm DBR diode

Czech Academy of Sciences Publication Activity Database

Řeřucha, Šimon; Yacoot, A.; Pham, Minh Tuan; Čížek, Martin; Hucl, Václav; Lazar, Josef; Číp, Ondřej

2017-01-01

Roč. 28, č. 4 (2017), s. 1-11, č. článku 045204. ISSN 0957-0233 R&D Projects: GA ČR GB14-36681G; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01; GA TA ČR TE01020233 Institutional support: RVO:68081731 Keywords : optical metrology * DBR laser diode * frequency stabilization * laser interferometry * dimensional metrology * iodine stabilization * displacement measurement Subject RIV: BH - Optics, Masers, Lasers OBOR OECD: Optics (including laser optics and quantum optics) Impact factor: 1.585, year: 2016

Tools intented to nuclear metrology

International Nuclear Information System (INIS)

Munayco Tasayco, A.F.

1980-08-01

The study undertaken in the metrological laboratory of the C.E.N. Saclay Electronics Services is intended to improve the measurement methods in two fields concerning nuclear instrumentation: the current's measurement in the range 1pA to 0,01 pA and the study of a measurement's system for the linear circuits used in spectrometer gamma ray with semiconductor. Two systems are now working. Its permit an improvement of precision measurement, an automation of the measurement process and many possibilities in the choice of parameters and the laying-out of results [fr

Metrology and quality control handbook

International Nuclear Information System (INIS)

Hofmann, D.

1983-01-01

This book tries to present the fundamentals of metrology and quality control in brief surveys. Compromises had to be made in order to reduce the material available to a sensible volume for the sake of clarity. This becomes evident by the following two restrictions which had to made: First, in dealing with the theoretical principles of metrology and quality control, mere reference had to be made in many cases to the great variety of special literature without discussing it to explain further details. Second, in dealing with the application of metrology and quality control techniques in practice, only the basic qantities of the International System of Units (SI) could be taken into account as a rule. Some readers will note that many special measuring methods and equipment known to them are not included in this book. I do hope, however, that this short-coming will show to have a positive effect, too. This book will show the reader how to find the basic quantities and units from the derived quantities and units, and the steps that are necessary to solve any kind of measuring task. (orig./RW) [de

Manufacturing and metrology for IR conformal windows and domes

Science.gov (United States)

Ferralli, Ian; Blalock, Todd; Brunelle, Matt; Lynch, Timothy; Myer, Brian; Medicus, Kate

2017-05-01

Freeform and conformal optics have the potential to dramatically improve optical systems by enabling systems with fewer optical components, reduced aberrations, and improved aerodynamic performance. These optical components differ from standard components in their surface shape, typically a non-symmetric equation based definition, and material properties. Traditional grinding and polishing tools are unable to handle these freeform shapes. Additionally, standard metrology tools cannot measure these surfaces. Desired substrates are typically hard ceramics, including poly-crystalline alumina or aluminum oxynitride. Notwithstanding the challenges that the hardness provides to manufacturing, these crystalline materials can be highly susceptible to grain decoration creating unacceptable scatter in optical systems. In this presentation, we will show progress towards addressing the unique challenges of manufacturing conformal windows and domes. Particular attention is given to our robotic polishing platform. This platform is based on an industrial robot adapted to accept a wide range of tooling and parts. The robot's flexibility has provided us an opportunity to address the unique challenges of conformal windows. Slurries and polishing active layers can easily be changed to adapt to varying materials and address grain decoration. We have the flexibility to change tool size and shape to address the varying sizes and shapes of conformal optics. In addition, the robotic platform can be a base for a deflectometry-based metrology tool to measure surface form error. This system, whose precision is independent of the robot's positioning accuracy, will allow us to measure optics in-situ saving time and reducing part risk. In conclusion, we will show examples of the conformal windows manufactured using our developed processes.

3D-SEM Metrology for Coordinate Measurements at the Nanometer Scale

DEFF Research Database (Denmark)

Carli, Lorenzo

to be addressed concerning uncertainty evaluation have been discussed. Most recent developments in the field of micro and nano-metrology, in terms of measuring machines and techniques, are described pointing out advantages and limitations. The importance of multi-sensor and multi-orientation strategy...

A Roadmap for Thermal Metrology

Science.gov (United States)

Bojkovski, J.; Fischer, J.; Machin, G.; Pavese, F.; Peruzzi, A.; Renaot, E.; Tegeler, E.

2009-02-01

A provisional roadmap for thermal metrology was developed in Spring 2006 as part of the EUROMET iMERA activity toward increasing impact from national investment in European metrology R&D. This consisted of two parts: one addressing the influence of thermal metrology on society, industry, and science, and the other specifying the requirements of enabling thermal metrology to serve future needs. The roadmap represents the shared vision of the EUROMET TC Therm committee as to how thermal metrology should develop to meet future requirements over the next 15 years. It is important to stress that these documents are a first attempt to roadmap the whole of thermal metrology and will certainly need regular review and revision to remain relevant and useful to the community they seek to serve. The first part of the roadmap, “Thermal metrology for society, industry, and science,” identifies the main social and economic triggers driving developments in thermal metrology—notably citizen safety and security, new production technologies, environment and global climate change, energy, and health. Stemming from these triggers, key targets are identified that require improved thermal measurements. The second part of the roadmap, “Enabling thermal metrology to serve future needs” identifies another set of triggers, like global trade and interoperability, future needs in transport, and the earth radiation budget. Stemming from these triggers, key targets are identified, such as improved realizations and dissemination of the SI unit the kelvin, anchoring the kelvin to the Boltzmann constant, k B, and calculating thermal properties from first principles. To facilitate these outcomes, the roadmap identifies the technical advances required in thermal measurement standards.

Metrology and process control: dealing with measurement uncertainty

Science.gov (United States)

Potzick, James

2010-03-01

Metrology is often used in designing and controlling manufacturing processes. A product sample is processed, some relevant property is measured, and the process adjusted to bring the next processed sample closer to its specification. This feedback loop can be remarkably effective for the complex processes used in semiconductor manufacturing, but there is some risk involved because measurements have uncertainty and product specifications have tolerances. There is finite risk that good product will fail testing or that faulty product will pass. Standard methods for quantifying measurement uncertainty have been presented, but the question arises: how much measurement uncertainty is tolerable in a specific case? Or, How does measurement uncertainty relate to manufacturing risk? This paper looks at some of the components inside this process control feedback loop and describes methods to answer these questions.

Radioactivity metrology

International Nuclear Information System (INIS)

Legrand, J.

1979-01-01

Some aspects of the radioactivity metrology are reviewed. Radioactivity primary references; absolute methods of radioactivity measurements used in the Laboratoire de Metrologie des Rayonnements Ionisants; relative measurement methods; traceability through international comparisons and interlaboratory tests; production and distribution of secondary standards [fr

Advanced overlay analysis through design based metrology

Science.gov (United States)

Ji, Sunkeun; Yoo, Gyun; Jo, Gyoyeon; Kang, Hyunwoo; Park, Minwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Yim, Donggyu; Maruyama, Kotaro; Park, Byungjun; Yamamoto, Masahiro

2015-03-01

As design rule shrink, overlay has been critical factor for semiconductor manufacturing. However, the overlay error which is determined by a conventional measurement with an overlay mark based on IBO and DBO often does not represent the physical placement error in the cell area. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion caused by etching or CMP also can be a source of the mismatch. In 2014, we have demonstrated that method of overlay measurement in the cell area by using DBM (Design Based Metrology) tool has more accurate overlay value than conventional method by using an overlay mark. We have verified the reproducibility by measuring repeatable patterns in the cell area, and also demonstrated the reliability by comparing with CD-SEM data. We have focused overlay mismatching between overlay mark and cell area until now, further more we have concerned with the cell area having different pattern density and etch loading. There appears a phenomenon which has different overlay values on the cells with diverse patterning environment. In this paper, the overlay error was investigated from cell edge to center. For this experiment, we have verified several critical layers in DRAM by using improved(Better resolution and speed) DBM tool, NGR3520.

Metrology Techniques for the Assembly of NCSX

International Nuclear Information System (INIS)

Priniski, C.; Dodson, T.; Duco, M.; Raftopoulos, S.; Ellis, R.; Brooks, A.

2009-01-01

In support of the National Compact Stellerator Experiment (NCSX), stellerator assembly activities continued this past year at the Princeton Plasma Physics Laboratory (PPPL) in partnership with the Oak Ridge National Laboratory (ORNL). The construction program saw the completion of the first two Half Field-Period Assemblies (HPA), each consisting of three modular coils. The full machine includes six such sub-assemblies. A single HPA consists of three of the NCSX modular coils wound and assembled at PPPL. These geometrically-complex three dimensional coils were wound using computer-aided metrology and CAD models to tolerances within +/- 0.5mm. The assembly of these coils required similar accuracy on a larger scale with the added complexity of more individual parts and fewer degrees of freedom for correction. Several new potential positioning issues developed for which measurement and control techniques were developed. To accomplish this, CAD coordinate-based computer metrology equipment and software similar to the solutions employed for winding the modular coils was used. Given the size of the assemblies, the primary tools were both interferometer aided and Absolute Distance Measurement (ADM)-only based laser trackers. In addition, portable Coordinate Measurement Machine (CMM) arms and some novel indirect measurement techniques were employed. This paper will detail both the use of CAD coordinate-based metrology technology and the techniques developed and employed for dimensional control of NSCX subassemblies. The results achieved and possible improvements to techniques will be discussed.

Metrology for industrial quantum communications: the MIQC project

Science.gov (United States)

Rastello, M. L.; Degiovanni, I. P.; Sinclair, A. G.; Kück, S.; Chunnilall, C. J.; Porrovecchio, G.; Smid, M.; Manoocheri, F.; Ikonen, E.; Kubarsepp, T.; Stucki, D.; Hong, K. S.; Kim, S. K.; Tosi, A.; Brida, G.; Meda, A.; Piacentini, F.; Traina, P.; Natsheh, A. Al; Cheung, J. Y.; Müller, I.; Klein, R.; Vaigu, A.

2014-12-01

The ‘Metrology for Industrial Quantum Communication Technologies’ project (MIQC) is a metrology framework that fosters development and market take-up of quantum communication technologies and is aimed at achieving maximum impact for the European industry in this area. MIQC is focused on quantum key distribution (QKD) technologies, the most advanced quantum-based technology towards practical application. QKD is a way of sending cryptographic keys with absolute security. It does this by exploiting the ability to encode in a photon's degree of freedom specific quantum states that are noticeably disturbed if an eavesdropper trying to decode it is present in the communication channel. The MIQC project has started the development of independent measurement standards and definitions for the optical components of QKD system, since one of the perceived barriers to QKD market success is the lack of standardization and quality assurance.

Improved capacity in ionizing radiation metrology at SANAEM

International Nuclear Information System (INIS)

Yucel, U.

2014-01-01

Full text : Turkey is planning to build nuclear power plants in the south and north coasts to supply the ever-increasing energy demand. The nuclear power plants based on old soviet technology in Armenia and Bulgaria close to Turkey's borders also makes constant monitoring of environmental radioactivity extremely important due to public health and environment contamination concerns. Radiation Metrology Division at SANAEM has been established in 2012 to provide uniformity and reliability of the measurements in the field of ionizing radiation metrology by R and D studies and by constituting, developing, keeping and extending internationally accepted reference measurement standards and techniques

At-wavelength Optical Metrology Development at the ALS

International Nuclear Information System (INIS)

Yuan, Sheng Sam; Goldberg, Kenneth A.; Yashchuk, Valeriy V.; Celestre, Richard; Mochi, Iacopo; Macdougall, James; Morrison, Gregory Y.; Smith, Brian V.; Domning, Edward E.; McKinney, Wayne R.; Warwick, Tony

2010-01-01

Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

Optical metrology techniques for dimensional stability measurements

NARCIS (Netherlands)

Ellis, Jonathan David

2010-01-01

This thesis work is optical metrology techniques to determine material stability. In addition to displacement interferometry, topics such as periodic nonlinearity, Fabry-Perot interferometry, refractometry, and laser stabilization are covered.

IT Security Standards and Legal Metrology - Transfer and Validation

Science.gov (United States)

Thiel, F.; Hartmann, V.; Grottker, U.; Richter, D.

2014-08-01

Legal Metrology's requirements can be transferred into the IT security domain applying a generic set of standardized rules provided by the Common Criteria (ISO/IEC 15408). We will outline the transfer and cross validation of such an approach. As an example serves the integration of Legal Metrology's requirements into a recently developed Common Criteria based Protection Profile for a Smart Meter Gateway designed under the leadership of the Germany's Federal Office for Information Security. The requirements on utility meters laid down in the Measuring Instruments Directive (MID) are incorporated. A verification approach to check for meeting Legal Metrology's requirements by their interpretation through Common Criteria's generic requirements is also presented.

FOREWORD: Materials metrology Materials metrology

Science.gov (United States)

Bennett, Seton; Valdés, Joaquin

2010-04-01

It seems that so much of modern life is defined by the materials we use. From aircraft to architecture, from cars to communications, from microelectronics to medicine, the development of new materials and the innovative application of existing ones have underpinned the technological advances that have transformed the way we live, work and play. Recognizing the need for a sound technical basis for drafting codes of practice and specifications for advanced materials, the governments of countries of the Economic Summit (G7) and the European Commission signed a Memorandum of Understanding in 1982 to establish the Versailles Project on Advanced Materials and Standards (VAMAS). This project supports international trade by enabling scientific collaboration as a precursor to the drafting of standards. The VAMAS participants recognized the importance of agreeing a reliable, universally accepted basis for the traceability of the measurements on which standards depend for their preparation and implementation. Seeing the need to involve the wider metrology community, VAMAS approached the Comité International des Poids et Mesures (CIPM). Following discussions with NMI Directors and a workshop at the BIPM in February 2005, the CIPM decided to establish an ad hoc Working Group on the metrology applicable to the measurement of material properties. The Working Group presented its conclusions to the CIPM in October 2007 and published its final report in 2008, leading to the signature of a Memorandum of Understanding between VAMAS and the BIPM. This MoU recognizes the work that is already going on in VAMAS as well as in the Consultative Committees of the CIPM and establishes a framework for an ongoing dialogue on issues of materials metrology. The question of what is meant by traceability in the metrology of the properties of materials is particularly vexed when the measurement results depend on a specified procedure. In these cases, confidence in results requires not only traceable

Enhanced resolution and accuracy of freeform metrology through Subaperture Stitching Interferometry

Science.gov (United States)

Supranowitz, Chris; Maloney, Chris; Murphy, Paul; Dumas, Paul

2017-10-01

Recent advances in polishing and metrology have addressed many of the challenges in the fabrication and metrology of freeform surfaces, and the manufacture of these surfaces is possible today. However, achieving the form and mid-spatial frequency (MSF) specifications that are typical of visible imaging systems remains a challenge. Interferometric metrology for freeform surfaces is thus highly desirable for such applications, but the capability is currently quite limited for freeforms. In this paper, we provide preliminary results that demonstrate accurate, high-resolution measurements of freeform surfaces using prototype software on QED's ASI™ (Aspheric Stitching Interferometer).

Simultaneous acquisition of 3D shape and deformation by combination of interferometric and correlation-based laser speckle metrology.

Science.gov (United States)

Dekiff, Markus; Berssenbrügge, Philipp; Kemper, Björn; Denz, Cornelia; Dirksen, Dieter

2015-12-01

A metrology system combining three laser speckle measurement techniques for simultaneous determination of 3D shape and micro- and macroscopic deformations is presented. While microscopic deformations are determined by a combination of Digital Holographic Interferometry (DHI) and Digital Speckle Photography (DSP), macroscopic 3D shape, position and deformation are retrieved by photogrammetry based on digital image correlation of a projected laser speckle pattern. The photogrammetrically obtained data extend the measurement range of the DHI-DSP system and also increase the accuracy of the calculation of the sensitivity vector. Furthermore, a precise assignment of microscopic displacements to the object's macroscopic shape for enhanced visualization is achieved. The approach allows for fast measurements with a simple setup. Key parameters of the system are optimized, and its precision and measurement range are demonstrated. As application examples, the deformation of a mandible model and the shrinkage of dental impression material are measured.

8th Brazilian Congress on Metrology (Metrologia 2015)

International Nuclear Information System (INIS)

2016-01-01

THE EIGHTH BRAZILIAN CONGRESS ON METROLOGY (METROLOGIA 2015) The United Nations celebrated 2015 as the International Year of Light. By a curious coincidence, many notable events in science and technology completed a multiple of 50 or 100 years in 2015. From the pioneering work of the wise Ibn Al-Haytham in 1015, through Fresnel, Maxwell, Einstein, the discovery of the cosmic microwave background, to the use of optical fibres in communications in 1965. Electromagnetic radiation is present in our daily lives in countless applications. It is remarkable that there is no way to think about these applications without thinking of measurements. From entangled photons to more prosaic public illumination of our daily life, we are intrinsically connected all the time with the luminous phenomena. Among other things, the light allows global communication on a large scale. It strengthens the internationalization of production processes, which brings considerable changes in relations, processes and economic structures, as well as it orients the social, political and cultural behaviour of any country. These conditions of this internationalization require interchangeability of parts of complex systems, translated into strict adherence to the standards and specifications that use increasingly accurate measurement techniques, as well as the growing demand from consumer markets for products and higher quality services. They also require innovation and improvements in domestic production to boost the competitiveness of industries in domestic and foreign markets. Thus, if the Science of Measurements is taken as a serious concern, countries are better prepared to evolve towards economic and social development. In this 8"t"h edition of the Brazilian Congress on Metrology (METROLOGIA 2015), in addition to the thematic sessions in various areas of Metrology and Conformity Assessment, we hold several satellite events. They are already traditional events or highlight important current issues

Metrology for the radiological early warning system in Europe. The ''MetroERM'' project; Metrologie fuer die radiologischen Fruehwarnsysteme in Europa. Das ''MetroERM''-Projekt

Energy Technology Data Exchange (ETDEWEB)

Neumaier, Stefan; Dombrowski, Harald [Physikalisch-Technische Bundesanstalt, Braunschweig (Germany)

2017-10-01

In the European radiological early warning system about 5500 stationary sensors are actually implemented that measure continuously the local dose rate. Alongside several hundred air dust collecting systems attribute to the measurement of airborne radioactivity. The local dose rates are transmitted hourly to a central data base that is operated on behalf of the EU commission. In significantly larger time intervals the measured data of the airborne radioactivity are transmitted. In case of a cross-border radiological accident these data are the basis for recommendations given by the EU commission to the member states for national counter measures. The focus of the project ''Metrology for radiological early warning networks in Europe'' is an improvement of the metrological quality and harmonization these data and the development of improved measuring systems and evaluation methods.

Metrology of ground-based satellite validation: co-location mismatch and smoothing issues of total ozone comparisons

Directory of Open Access Journals (Sweden)

T. Verhoelst

2015-12-01

Full Text Available Comparisons with ground-based correlative measurements constitute a key component in the validation of satellite data on atmospheric composition. The error budget of these comparisons contains not only the measurement errors but also several terms related to differences in sampling and smoothing of the inhomogeneous and variable atmospheric field. A versatile system for Observing System Simulation Experiments (OSSEs, named OSSSMOSE, is used here to quantify these terms. Based on the application of pragmatic observation operators onto high-resolution atmospheric fields, it allows a simulation of each individual measurement, and consequently, also of the differences to be expected from spatial and temporal field variations between both measurements making up a comparison pair. As a topical case study, the system is used to evaluate the error budget of total ozone column (TOC comparisons between GOME-type direct fitting (GODFITv3 satellite retrievals from GOME/ERS2, SCIAMACHY/Envisat, and GOME-2/MetOp-A, and ground-based direct-sun and zenith–sky reference measurements such as those from Dobsons, Brewers, and zenith-scattered light (ZSL-DOAS instruments, respectively. In particular, the focus is placed on the GODFITv3 reprocessed GOME-2A data record vs. the ground-based instruments contributing to the Network for the Detection of Atmospheric Composition Change (NDACC. The simulations are found to reproduce the actual measurements almost to within the measurement uncertainties, confirming that the OSSE approach and its technical implementation are appropriate. This work reveals that many features of the comparison spread and median difference can be understood as due to metrological differences, even when using strict co-location criteria. In particular, sampling difference errors exceed measurement uncertainties regularly at most mid- and high-latitude stations, with values up to 10 % and more in extreme cases. Smoothing difference errors only

An active pixels spectrometers for neutronic fields metrology

International Nuclear Information System (INIS)

Taforeau, Julien

2013-01-01

The fundamental metrology is responsible for the sustainability of the measurement systems and handles to supply the reference standards. Concerning the metrology of ionizing radiations and, in particular the neutron metrology, detectors standards are used to characterize reference fields, in terms of energy and fluence. The dosimeters or particle detectors are calibrated on these reference fields. This thesis presents the development of a neutron spectrometer neutron candidate to the status of primary standard for the characterization of neutron fields in the range from 5 to 20 MeV. The spectrometer uses the recoil proton telescope as detection principle; the CMOS technology, through three sensor positions, is taking advantage to realize the tracking of protons. A Si(Li) detector handles the measure of the residual proton energy. The device simulations, realized under MCNPX, allow to estimate its performances and to validate the neutron energy reconstruction. An essential step of characterization of the telescope elements and in particular of CMOS sensors is also proposed to guarantee the validity of posterior experimental measurements. The tests realized as well in mono-energy fields as in radionuclide source show the very good performances of the system. The quantification of uncertainties indicates an energy estimation with 1.5 % accuracy and a resolution of less than 6 %. The fluence measurement is performed with an uncertainty about 4 to 6%. (author)

Post-irradiation examination of a fuel pin using a microscopic X-ray system: Measurement of carbon deposition and pin metrology

International Nuclear Information System (INIS)

Gras, Ch.; Stanley, S.J.

2008-01-01

The paper presents some interesting aspects associated with X-ray imaging and its potential application in the nuclear industry. The feasibility of using X-ray technology for the post-irradiation examination of a fuel pin has been explored, more specifically pin metrology and carbon deposition measurement. The non-active sample was specially designed to mimic the structure of an AGR fuel pin whilst a carbon based material was applied to the mock up fuel rod in order to mimic carbon deposition. Short duration low energy (50 kV) 2D digital radiography was employed and provided encouraging results (with respect to carbon deposition thickness and structure measurements) for the mock up fuel pin with a spatial resolution of around 10 μm. Obtaining quantitative data from the resultant images is the principal added value associated with X-ray imaging. A higher intensity X-ray beam (≥90 kV) was also used in conjunction with the low energy set-up to produce a clear picture of the cladding as well as the interface between the lead (Pb mimics the uranium oxide) and stainless steel cladding. Spent fuel metrology and routine radiography are two additional tasks that X-ray imaging could perform for the post-irradiation examination programme. Therefore, when compared to other techniques developed to deliver information on one particular parameter, X-ray imaging offers the possibility to extract useful information on a range of parameters

Advanced metrology by offline SEM data processing

Science.gov (United States)

Lakcher, Amine; Schneider, Loïc.; Le-Gratiet, Bertrand; Ducoté, Julien; Farys, Vincent; Besacier, Maxime

2017-06-01

Today's technology nodes contain more and more complex designs bringing increasing challenges to chip manufacturing process steps. It is necessary to have an efficient metrology to assess process variability of these complex patterns and thus extract relevant data to generate process aware design rules and to improve OPC models. Today process variability is mostly addressed through the analysis of in-line monitoring features which are often designed to support robust measurements and as a consequence are not always very representative of critical design rules. CD-SEM is the main CD metrology technique used in chip manufacturing process but it is challenged when it comes to measure metrics like tip to tip, tip to line, areas or necking in high quantity and with robustness. CD-SEM images contain a lot of information that is not always used in metrology. Suppliers have provided tools that allow engineers to extract the SEM contours of their features and to convert them into a GDS. Contours can be seen as the signature of the shape as it contains all the dimensional data. Thus the methodology is to use the CD-SEM to take high quality images then generate SEM contours and create a data base out of them. Contours are used to feed an offline metrology tool that will process them to extract different metrics. It was shown in two previous papers that it is possible to perform complex measurements on hotspots at different process steps (lithography, etch, copper CMP) by using SEM contours with an in-house offline metrology tool. In the current paper, the methodology presented previously will be expanded to improve its robustness and combined with the use of phylogeny to classify the SEM images according to their geometrical proximities.

Metrological Array of Cyber-Physical Systems. Part 3. Smart Energy-Efficient House

Directory of Open Access Journals (Sweden)

Ihor HNES

2015-04-01

Full Text Available Smart energy-efficient houses as the components of Cyber-Physical Systems are developed intensively. The main stream of progress consists in the research of Smart houses’ energy supply. By this option the mentioned objects are advancing from passive houses through net-zero energy houses to active houses that are capable of sharing their own accumulated energy with other components of Cyber-Physical Systems. We consider the problems of studying the metrology models and measuring the heat dissipation in such houses trying to apply network and software achievements as well as the new types of devices with improved characteristics.

X-ray pulse wavefront metrology using speckle tracking

International Nuclear Information System (INIS)

Berujon, Sebastien; Ziegler, Eric; Cloetens, Peter

2015-01-01

The theoretical description and experimental implementation of a speckle-tracking-based instrument which permits the characterisation of X-ray pulse wavefronts. An instrument allowing the quantitative analysis of X-ray pulsed wavefronts is presented and its processing method explained. The system relies on the X-ray speckle tracking principle to accurately measure the phase gradient of the X-ray beam from which beam optical aberrations can be deduced. The key component of this instrument, a semi-transparent scintillator emitting visible light while transmitting X-rays, allows simultaneous recording of two speckle images at two different propagation distances from the X-ray source. The speckle tracking procedure for a reference-less metrology mode is described with a detailed account on the advanced processing schemes used. A method to characterize and compensate for the imaging detector distortion, whose principle is also based on speckle, is included. The presented instrument is expected to find interest at synchrotrons and at the new X-ray free-electron laser sources under development worldwide where successful exploitation of beams relies on the availability of an accurate wavefront metrology

A Laser Metrology/Viewing System for ITER In-Vessel Inspection

International Nuclear Information System (INIS)

Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Menon, M.M.; Dagher, M.A.; Slotwinski, A.

1997-10-01

This paper identifies the requirements for a remotely operated precision laser ranging system for the International Thermonuclear Experimental Reactor. The inspection system is used for metrology and viewing, and must be capable of achieving submillimeter accuracy and operation in a reactor vessel that has high gamma radiation, high vacuum, elevated temperature, and magnetic field levels. A coherent, frequency modulated laser radar system is under development to meet these requirements. The metrology/viewing sensor consists of a compact laser-optic module linked through fiberoptics to the laser source and imaging units, located outside the harsh environment. The deployment mechanism is a remotely operated telescopic mast. Gamma irradiation up to 10 7 Gy was conducted on critical sensor components with no significant impact to data transmission, and analysis indicates that critical sensor components can operate in a magnetic field with certain design modifications. Plans for testing key components in a magnetic field are underway

Metrology's role in quality assurance

International Nuclear Information System (INIS)

Zeederberg, L.B.

1982-01-01

Metrology, the science of measurement, is playing an increasing role in modern industry as part of an on-going quality assurance programme. At Escom, quality assurance was critical during the construction of the Koeberg nuclear facility, and also a function in controlling services provided by Escom. This article deals with the role metrology plays in quality assurance

System for automatic gauge block length measurement optimized for secondary length metrology

Czech Academy of Sciences Publication Activity Database

Buchta, Zdeněk; Šarbort, Martin; Čížek, Martin; Hucl, Václav; Řeřucha, Šimon; Pikálek, Tomáš; Dvořáčková, Š.; Dvořáček, F.; Kůr, J.; Konečný, P.; Weigl, M.; Lazar, Josef; Číp, Ondřej

2017-01-01

Roč. 49, JULY (2017), s. 322-331 ISSN 0141-6359 R&D Projects: GA TA ČR(CZ) TA03010663; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01 Institutional support: RVO:68081731 Keywords : low-coherence interferometry * laser interferometry * Gauge block * metrology Subject RIV: BH - Optics, Masers, Laser s OBOR OECD: Optics (including laser optics and quantum optics) Impact factor: 2.237, year: 2016

NIF Target Assembly Metrology Methodology and Results

Energy Technology Data Exchange (ETDEWEB)

Alger, E. T. [General Atomics, San Diego, CA (United States); Kroll, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Dzenitis, E. G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Montesanti, R. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Hughes, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Swisher, M. [IAP, Livermore, CA (United States); Taylor, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Segraves, K. [IAP, Livermore, CA (United States); Lord, D. M. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Reynolds, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Castro, C. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Edwards, G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

2011-01-01

During our inertial confinement fusion (ICF) experiments at the National Ignition Facility (NIF) we require cryogenic targets at the 1-cm scale to be fabricated, assembled, and metrologized to micron-level tolerances. During assembly of these ICF targets, there are physical dimensmetrology is completed using optical coordinate measurement machines that provide repeatable measurements with micron precision, while also allowing in-process data collection for absolute accuracy in assembly. To date, 51 targets have been assembled and metrologized, and 34 targets have been successfully fielded on NIF relying on these metrology data. In the near future, ignition experiments on NIF will require tighter tolerances and more demanding target assembly and metrology capability. Metrology methods, calculations, and uncertainty estimates will be discussed. Target diagnostic port alignment, target position, and capsule location results will be reviewed for the 2009 Energetics Campaign. The information is presented via control charts showing the effect of process improvements that were made during target production. Certain parameters, including capsule position, met the 2009 campaign specifications but will have much tighter requirements in the future. Finally, in order to meet these new requirements assembly process changes and metrology capability upgrades will be necessary.

Dimensional micro and nano metrology

DEFF Research Database (Denmark)

Hansen, Hans Nørgaard; da Costa Carneiro, Kim; Haitjema, Han

2006-01-01

The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer these chal......The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer...... these challenges. The developments have to include new measuring principles and instrumentation, tolerancing rules and procedures as well as traceability and calibration. The current paper describes issues and challenges in dimensional micro and nano metrology by reviewing typical measurement tasks and available...

Critical issues in overlay metrology

International Nuclear Information System (INIS)

Sullivan, Neal T.

2001-01-01

In this paper, following an overview of overlay metrology, the difficult relationship of overlay with device performance and yield is discussed and supported with several examples. This is followed by a discussion of the impending collision of metrology equipment performance and 'real' process tolerances for sub 0.18 um technologies. This convergence of tolerance and performance is demonstrated to lead to the current emergence of real-time overlay modeling in a feed-forward/feedback process environment and the associated metrology/sampling implications. This modeling takes advantage of the wealth of understanding concerning the systematic behavior of overlay registration errors. Finally, the impact of new process technologies (RET, OAI, CPSM, CMP, and etc.) on the measurement target is discussed and shown to de-stabilize overlay performance on standard overlay measurement target designs

Metrological characteristics of the new BSS2 beta secondary standard system

International Nuclear Information System (INIS)

Reynaldo, Sibele R.

2005-01-01

Due to the increased interest and the importance of beta radiation dosimetry for radiation protection purposes, the Centro de Desenvolvimento da Tecnologia Nuclear. MG, Brazil, acquired the newest Beta Secondary Standard system (BSS2) in order to replace the old BSS1 model, with the goal of implement a beta radiation metrology laboratory and provide the corresponding reference radiation. The new system BSS2, unique in Latin America, requires operational testing and metrological characterization for reliability purposes. For this, some comparative investigations of the two systems were made. The influence of opening and closing the shutter in the final dose of radiation was identified as the highest in the BSS2 in relation to the one founded in BSS1, justified by the structural difference of the shutters of the systems and the reproducibility of source-detector geometry was better in BSS2, because of the robustness of the same

Metrology Sampling Strategies for Process Monitoring Applications

KAUST Repository

Vincent, Tyrone L.

2011-11-01

Shrinking process windows in very large scale integration semiconductor manufacturing have already necessitated the development of control systems capable of addressing sub-lot-level variation. Within-wafer control is the next milestone in the evolution of advanced process control from lot-based and wafer-based control. In order to adequately comprehend and control within-wafer spatial variation, inline measurements must be performed at multiple locations across the wafer. At the same time, economic pressures prompt a reduction in metrology, for both capital and cycle-time reasons. This paper explores the use of modeling and minimum-variance prediction as a method to select the sites for measurement on each wafer. The models are developed using the standard statistical tools of principle component analysis and canonical correlation analysis. The proposed selection method is validated using real manufacturing data, and results indicate that it is possible to significantly reduce the number of measurements with little loss in the information obtained for the process control systems. © 2011 IEEE.

A new approach to stitching optical metrology data

Science.gov (United States)

King, Christopher W.

The next generation of optical instruments, including telescopes and imaging apparatus, will generate an increased requirement for larger and more complex optical forms. A major limiting factor for the production of such optical components is the metrology: how do we measure such parts and with respect to what reference datum This metrology can be thought of as part of a complete cycle in the production of optical components and it is currently the most challenging aspect of production. This thesis investigates a new and complete approach to stitching optical metrology data to extend the effective aperture or, in future, the dynamic range of optical metrology instruments. A practical approach is used to build up a complete process for stitching on piano and spherical parts. The work forms a basis upon which a stitching system for aspheres might be developed in the future, which is inherently more complicated. Beginning with a historical perspective and a review of optical polishing and metrology, the work presented relates the commercially available metrology instruments to the stitching process developed. The stitching is then performed by a numerical optimization routine that seeks to join together overlapping sub-aperture measurements by consideration of the aberrations introduced by the measurement scenario, and by the overlap areas between measurements. The stitching is part of a larger project, the PPARC Optical Manipulation and Metrology project, and was to benefit from new wavefront sensing technology developed by a project partner, and to be used for the sub-aperture measurement. Difficult mathematical problems meant that such a wavefront sensor was not avail able for this work and a work-around was therefore developed using commercial instruments. The techniques developed can be adapted to work on commercial ma chine platforms, and in partuicular, the OMAM NPL/UCL swing-arm profilometer described in chapter 5, or the computer controlled polishing machines

Metrology at Philip Morris Europe

Directory of Open Access Journals (Sweden)

Gualandris R

2014-12-01

Full Text Available The importance of the metrology function at Philip Morris Europe (PME, a multinational organisation producing at over 40 sites in the European, Middle Eastern and African Regions is presented. Standardisation of test methods and equipment as well as the traceability of calibration gauges to the same reference gauge are essential in order to obtain comparable results among the various production centers. The metrology function as well as the qualification of instruments and the drafting of test and calibration operating procedures for this region are conducted or co-ordinated by the Research and Development Department in Neuchatel, Switzerland. In this paper the metrology function within PME is presented based on the measurement of the resistance to draw for which the PME R&D laboratory is accredited (ISO/CEI 17025, as both a calibration and a testing laboratory. The following topics are addressed in this paper: traceability of calibration standards to national standards; comparison of results among manufacturing centres; the choice, the budget as well as the computation of uncertainties. Furthermore, some practical aspects related to the calibration and use of the glass multicapillary gauges are discussed.

Radionuclide metrology: traceability and response to a radiological accident

Energy Technology Data Exchange (ETDEWEB)

Tauhata, L.; Cruz, P.A.L. da; Silva, C.J. da; Delgado, J.U.; Oliveira, A.E. de; Oliveira, E.M. de; Poledna, R.; Loureiro, J. dos S.; Ferreira Filho, A.L.; Silva, R.L. da; Filho, O. L.T.; Santos, A.R.L. dos; Veras, E.V. de; Rangel, J. de A.; Quadros, A.L.L.; Araújo, M.T.F. de; Souza, P.S. de; Ruzzarim, A.; Conceição, D.A. da; Iwahara, A., E-mail: palcruz@ird.gov.br [Instituto de Radioproteção e Dosimetria (LNMRI/IRD/CNEN-RJ), Rio de Janeiro, RJ (Brazil). Lab. Nacional de Metrologia das Radiações Ionizantes

2017-07-01

In the case of a radiological accident, there are characteristic phases: discovery and initial assistance with first aid; the triage and monitoring of the affected population; the release of the affected people; forward the victims to medical care; as well as the preparation of the report on the accident. In addition, studies and associated researches performed in the later period. Monitors, dosimeters and measuring systems should be calibrated by contaminating radionuclide standards. The radioactive sources used must be metrologically reliable. In Brazil, this function is performed by LNMRI/IRD/CNEN, designated by INMETRO, which Radionuclide Metrology Laboratory is responsible for the standardization and supply of radioactive sources in diverse geometries and matrices. This laboratory has a stock of radionuclide solutions with controlled environmental variables for the preparation of sources, which are calibrated and standardized by mean of primary and secondary systems. It is also responsible for the dissemination of standards and, in order to establish the metrological traceability of national standards, participates in international key-comparisons promoted by BIPM and regional metrology organizations. Internally, it promotes the National Comparison Programs for laboratories for the analysis of environmental samples and the traceability for producing centers of radiopharmaceuticals and Nuclear Medicine Services in the country. The paper presents the demand for {sup 137}Cs related to the radioactive accident in Goiania/Brazil and the significant results for the main radionuclides standardized by the Radionuclide Metrology Laboratory for international key-comparisons and national comparisons to provide metrological traceability. With the obtained results, the LNMRI of Brazil integrates the international metrology BIPM network and fulfills its function of supplying, with about a hundred of radioactive standards, the country's needs in different applications

Radionuclide metrology: traceability and response to a radiological accident

International Nuclear Information System (INIS)

Tauhata, L.; Cruz, P.A.L. da; Silva, C.J. da; Delgado, J.U.; Oliveira, A.E. de; Oliveira, E.M. de; Poledna, R.; Loureiro, J. dos S.; Ferreira Filho, A.L.; Silva, R.L. da; Filho, O. L.T.; Santos, A.R.L. dos; Veras, E.V. de; Rangel, J. de A.; Quadros, A.L.L.; Araújo, M.T.F. de; Souza, P.S. de; Ruzzarim, A.; Conceição, D.A. da; Iwahara, A.

2017-01-01

In the case of a radiological accident, there are characteristic phases: discovery and initial assistance with first aid; the triage and monitoring of the affected population; the release of the affected people; forward the victims to medical care; as well as the preparation of the report on the accident. In addition, studies and associated researches performed in the later period. Monitors, dosimeters and measuring systems should be calibrated by contaminating radionuclide standards. The radioactive sources used must be metrologically reliable. In Brazil, this function is performed by LNMRI/IRD/CNEN, designated by INMETRO, which Radionuclide Metrology Laboratory is responsible for the standardization and supply of radioactive sources in diverse geometries and matrices. This laboratory has a stock of radionuclide solutions with controlled environmental variables for the preparation of sources, which are calibrated and standardized by mean of primary and secondary systems. It is also responsible for the dissemination of standards and, in order to establish the metrological traceability of national standards, participates in international key-comparisons promoted by BIPM and regional metrology organizations. Internally, it promotes the National Comparison Programs for laboratories for the analysis of environmental samples and the traceability for producing centers of radiopharmaceuticals and Nuclear Medicine Services in the country. The paper presents the demand for 137 Cs related to the radioactive accident in Goiania/Brazil and the significant results for the main radionuclides standardized by the Radionuclide Metrology Laboratory for international key-comparisons and national comparisons to provide metrological traceability. With the obtained results, the LNMRI of Brazil integrates the international metrology BIPM network and fulfills its function of supplying, with about a hundred of radioactive standards, the country's needs in different applications

Industrial Photogrammetry - Accepted Metrology Tool or Exotic Niche

Science.gov (United States)

Bösemann, Werner

2016-06-01

New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]). This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly) illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM's. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

INDUSTRIAL PHOTOGRAMMETRY - ACCEPTED METROLOGY TOOL OR EXOTIC NICHE

Directory of Open Access Journals (Sweden)

W. Bösemann

2016-06-01

Full Text Available New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]. This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM’s. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

Application of Vision Metrology to In-Orbit Measurement of Large Reflector Onboard Communication Satellite for Next Generation Mobile Satellite Communication

Science.gov (United States)

Akioka, M.; Orikasa, T.; Satoh, M.; Miura, A.; Tsuji, H.; Toyoshima, M.; Fujino, Y.

2016-06-01

Satellite for next generation mobile satellite communication service with small personal terminal requires onboard antenna with very large aperture reflector larger than twenty meters diameter because small personal terminal with lower power consumption in ground base requires the large onboard reflector with high antenna gain. But, large deployable antenna will deform in orbit because the antenna is not a solid dish but the flexible structure with fine cable and mesh supported by truss. Deformation of reflector shape deteriorate the antenna performance and quality and stability of communication service. However, in case of digital beam forming antenna with phased array can modify the antenna beam performance due to adjustment of excitation amplitude and excitation phase. If we can measure the reflector shape precisely in orbit, beam pattern and antenna performance can be compensated with the updated excitation amplitude and excitation phase parameters optimized for the reflector shape measured every moment. Softbank Corporation and National Institute of Information and Communications Technology has started the project "R&D on dynamic beam control technique for next generation mobile communication satellite" as a contracted research project sponsored by Ministry of Internal Affairs and Communication of Japan. In this topic, one of the problem in vision metrology application is a strong constraints on geometry for camera arrangement on satellite bus with very limited space. On satellite in orbit, we cannot take many images from many different directions as ordinary vision metrology measurement and the available area for camera positioning is quite limited. Feasibility of vision metrology application and general methodology to apply to future mobile satellite communication satellite is to be found. Our approach is as follows: 1) Development of prototyping simulator to evaluate the expected precision for network design in zero order and first order 2) Trial

Coherence enhanced quantum metrology in a nonequilibrium optical molecule

Science.gov (United States)

Wang, Zhihai; Wu, Wei; Cui, Guodong; Wang, Jin

2018-03-01

We explore the quantum metrology in an optical molecular system coupled to two environments with different temperatures, using a quantum master equation beyond secular approximation. We discover that the steady-state coherence originating from and sustained by the nonequilibrium condition can enhance quantum metrology. We also study the quantitative measures of the nonequilibrium condition in terms of the curl flux, heat current and entropy production at the steady state. They are found to grow with temperature difference. However, an apparent paradox arises considering the contrary behaviors of the steady-state coherence and the nonequilibrium measures in relation to the inter-cavity coupling strength. This paradox is resolved by decomposing the heat current into a population part and a coherence part. Only the latter, the coherence part of the heat current, is tightly connected to the steady-state coherence and behaves similarly with respect to the inter-cavity coupling strength. Interestingly, the coherence part of the heat current flows from the low-temperature reservoir to the high-temperature reservoir, opposite to the direction of the population heat current. Our work offers a viable way to enhance quantum metrology for open quantum systems through steady-state coherence sustained by the nonequilibrium condition, which can be controlled and manipulated to maximize its utility. The potential applications go beyond quantum metrology and extend to areas such as device designing, quantum computation and quantum technology in general.

Measurement configuration optimization for dynamic metrology using Stokes polarimetry

Science.gov (United States)

Liu, Jiamin; Zhang, Chuanwei; Zhong, Zhicheng; Gu, Honggang; Chen, Xiuguo; Jiang, Hao; Liu, Shiyuan

2018-05-01

As dynamic loading experiments such as a shock compression test are usually characterized by short duration, unrepeatability and high costs, high temporal resolution and precise accuracy of the measurements is required. Due to high temporal resolution up to a ten-nanosecond-scale, a Stokes polarimeter with six parallel channels has been developed to capture such instantaneous changes in optical properties in this paper. Since the measurement accuracy heavily depends on the configuration of the probing beam incident angle and the polarizer azimuth angle, it is important to select an optimal combination from the numerous options. In this paper, a systematic error propagation-based measurement configuration optimization method corresponding to the Stokes polarimeter was proposed. The maximal Frobenius norm of the combinatorial matrix of the configuration error propagating matrix and the intrinsic error propagating matrix is introduced to assess the measurement accuracy. The optimal configuration for thickness measurement of a SiO2 thin film deposited on a Si substrate has been achieved by minimizing the merit function. Simulation and experimental results show a good agreement between the optimal measurement configuration achieved experimentally using the polarimeter and the theoretical prediction. In particular, the experimental result shows that the relative error in the thickness measurement can be reduced from 6% to 1% by using the optimal polarizer azimuth angle when the incident angle is 45°. Furthermore, the optimal configuration for the dynamic metrology of a nickel foil under quasi-dynamic loading is investigated using the proposed optimization method.

Metrology of the radon in air volume activity at the italian radon reference chamber

Energy Technology Data Exchange (ETDEWEB)

Sciocchetti, G.; Cotellessa, G.; Soldano, E.; Pagliari, M. [Istituto Nazionale di Metrologia delle Radiazioni Ionizzanti, ENEA Centro Ricerche Casaccia Roma (Italy)

2006-07-01

The approach of the Italian National Institute of Ionising Radiations (I.N.M.R.I.-ENEA) on radon metrology has been based on a complete and integrated system which can be used to calibrate the main types of {sup 222}Rn in air measuring instruments with international traceability. The Italian radon reference chamber is a research and calibration facility developed at the Casaccia Research Center in Roma. This facility has an inner volume of one m{sup 3}. The wall is a cylindrical stainless steel vessel coupled with an automated climate apparatus operated both at steady and dynamic conditions. The control and data acquisition equipment is based on Radotron system, developed to automate the multitasking management of different sets of radon monitors and climatic sensors. A novel approach for testing passive radon monitors with an alpha track detector exposure standard has been developed. It is based on the direct measurement of radon exposure with a set of passive integrating monitors based on the new ENEA piston radon exposure meter. This paper describes the methodological approach on radon metrology, the status-of-art of experimental apparatus and the standardization procedures. (authors)

Metrology of the radon in air volume activity at the italian radon reference chamber

International Nuclear Information System (INIS)

Sciocchetti, G.; Cotellessa, G.; Soldano, E.; Pagliari, M.

2006-01-01

The approach of the Italian National Institute of Ionising Radiations (I.N.M.R.I.-ENEA) on radon metrology has been based on a complete and integrated system which can be used to calibrate the main types of 222 Rn in air measuring instruments with international traceability. The Italian radon reference chamber is a research and calibration facility developed at the Casaccia Research Center in Roma. This facility has an inner volume of one m 3 . The wall is a cylindrical stainless steel vessel coupled with an automated climate apparatus operated both at steady and dynamic conditions. The control and data acquisition equipment is based on Radotron system, developed to automate the multitasking management of different sets of radon monitors and climatic sensors. A novel approach for testing passive radon monitors with an alpha track detector exposure standard has been developed. It is based on the direct measurement of radon exposure with a set of passive integrating monitors based on the new ENEA piston radon exposure meter. This paper describes the methodological approach on radon metrology, the status-of-art of experimental apparatus and the standardization procedures. (authors)

Distributed large-scale dimensional metrology new insights

CERN Document Server

Franceschini, Fiorenzo; Maisano, Domenico

2011-01-01

Focuses on the latest insights into and challenges of distributed large scale dimensional metrology Enables practitioners to study distributed large scale dimensional metrology independently Includes specific examples of the development of new system prototypes

[The EFS metrology: From the production to the reason].

Science.gov (United States)

Reifenberg, J-M; Riout, E; Leroy, A; Begue, S

2014-06-01

In order to answer statutory requirements and to anticipate the future needs and standards, the EFS is committed, since a few years, in a process of harmonization of its metrology function. In particular, the institution has opted for the skills development by internalizing the metrological traceability of the main critical quantities (temperature, volumetric) measurements. The development of metrology so resulted in a significant increase in calibration and testing activities. Methods are homogenized and improved through accreditations. The investment strategies are based on more and more demanding specifications. The performance of the equipments is better known and mastered. Technical expertise and maturity of the national metrology function today are assets to review in more informed ways the appropriateness of the applied periodicities. Analysis of numerous information and data in the calibration and testing reports could be pooled and operated on behalf of the unique establishment. The objective of this article is to illustrate these reflections with a few examples from of a feedback of the EFS Pyrénées Méditerranée. The analysis of some methods of qualification, the exploitation of the historical metrology in order to quantify the risk of non-compliance, and to adapt the control strategy, analysis of the criticality of an instrument in a measurement process, risk analyses are tools that deserve to be more widely exploited for that discipline wins in efficiency at the national level. Copyright © 2014 Elsevier Masson SAS. All rights reserved.

An OCD perspective of line edge and line width roughness metrology

Science.gov (United States)

Bonam, Ravi; Muthinti, Raja; Breton, Mary; Liu, Chi-Chun; Sieg, Stuart; Seshadri, Indira; Saulnier, Nicole; Shearer, Jeffrey; Patlolla, Raghuveer; Huang, Huai

2017-03-01

Metrology of nanoscale patterns poses multiple challenges that range from measurement noise, metrology errors, probe size etc. Optical Metrology has gained a lot of significance in the semiconductor industry due to its fast turn around and reliable accuracy, particularly to monitor in-line process variations. Apart from monitoring critical dimension, thickness of films, there are multiple parameters that can be extracted from Optical Metrology models3. Sidewall angles, material compositions etc., can also be modeled to acceptable accuracy. Line edge and Line Width roughness are much sought of metrology following critical dimension and its uniformity, although there has not been much development in them with optical metrology. Scanning Electron Microscopy is still used as a standard metrology technique for assessment of Line Edge and Line Width roughness. In this work we present an assessment of Optical Metrology and its ability to model roughness from a set of structures with intentional jogs to simulate both Line edge and Line width roughness at multiple amplitudes and frequencies. We also present multiple models to represent roughness and extract relevant parameters from Optical metrology. Another critical aspect of optical metrology setup is correlation of measurement to a complementary technique to calibrate models. In this work, we also present comparison of roughness parameters extracted and measured with variation of image processing conditions on a commercially available CD-SEM tool.

Experimental realization of the quantum metrological triangle experiment

Energy Technology Data Exchange (ETDEWEB)

Chenaud, B; Devoille, L; Steck, B; Feltin, N; Gonzalez-Cano, A; Poirier, W; Schopfer, F; Spengler, G; Djordjevic, S; Seron, O; Piquemal, F [Laboratoire national de metrologie et d' essais (LNE), Trappes (France); Lotkhov, S [Physikalisch-Technische Bundesanstalt (PTB), Braunschweig (Germany)], E-mail: laurent.devoille@lne.fr

2009-02-01

The quantum metrological triangle experiment (QMTE) consists in realizing Ohm's law with Josephson (JE), quantum Hall (QHE) and single electron tunneling (SET) effects. The aim is to check the consistency of the link among the phenomenological constants K {sub J}, R{sub K} and Q {sub X} involved in these effects and theoretically expressed with the fundamental constants e and h. Such an experiment could be a contribution for a new definition of the systeme international d'unites (SI) base units. In the QMTE, a current generated by a SET device flows through a resistor calibrated against QHE standard and the voltage induced at its terminals is compared to the metrological voltage generated by a Josephson junctions array. At LNE, the studied SET devices are 3 junctions single electron pumps with on chip resistors. The quantized current generated by this pump is theoretically equal to ef (f is the frequency of the driving signals applied on the gates) and is measured through a cryogenic current comparator (CCC), which allows to amplify the low pumping current with a metrological accuracy. We will present and discuss the experimental set-up developed at LNE and the first results. In addition to the main aim of QMTE described above, these preliminary results are also a first step towards a determination of e.

Overcoming the Invisibility of Metrology: A Reading Measurement Network for Education and the Social Sciences

Science.gov (United States)

Fisher, William P., Jr.; Stenner, A. Jackson

2013-09-01

The public and researchers in psychology and the social sciences are largely unaware of the huge resources invested in metrology and standards in science and commerce, for understandable reasons, but with unfortunate consequences. Measurement quality varies widely in fields lacking uniform standards, making it impossible to coordinate local behaviours and decisions in tune with individually observed instrument readings. However, recent developments in reading measurement have effectively instituted metrological traceability methods within elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia. Given established patterns in the history of science, it may be reasonable to expect that widespread routine reproduction of controlled effects expressed in uniform units in the social sciences may lead to significant developments in theory and practice.

Overcoming the Invisibility of Metrology: A Reading Measurement Network for Education and the Social Sciences

International Nuclear Information System (INIS)

Fisher, William P Jr; Stenner, A Jackson

2013-01-01

The public and researchers in psychology and the social sciences are largely unaware of the huge resources invested in metrology and standards in science and commerce, for understandable reasons, but with unfortunate consequences. Measurement quality varies widely in fields lacking uniform standards, making it impossible to coordinate local behaviours and decisions in tune with individually observed instrument readings. However, recent developments in reading measurement have effectively instituted metrological traceability methods within elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia. Given established patterns in the history of science, it may be reasonable to expect that widespread routine reproduction of controlled effects expressed in uniform units in the social sciences may lead to significant developments in theory and practice

Software-based acoustical measurements

CERN Document Server

Miyara, Federico

2017-01-01

This textbook provides a detailed introduction to the use of software in combination with simple and economical hardware (a sound level meter with calibrated AC output and a digital recording system) to obtain sophisticated measurements usually requiring expensive equipment. It emphasizes the use of free, open source, and multiplatform software. Many commercial acoustical measurement systems use software algorithms as an integral component; however the methods are not disclosed. This book enables the reader to develop useful algorithms and provides insight into the use of digital audio editing tools to document features in the signal. Topics covered include acoustical measurement principles, in-depth critical study of uncertainty applied to acoustical measurements, digital signal processing from the basics, and metrologically-oriented spectral and statistical analysis of signals. The student will gain a deep understanding of the use of software for measurement purposes; the ability to implement software-based...

European Congress on Optics Applied to Metrology /METROP/, 2nd, Strasbourg, France, November 26-30, 1979, Proceedings

International Nuclear Information System (INIS)

Grosmann, M.; Meyrueis, P.

1980-01-01

The paper deals with speckle metrology, advances in classical optical metrology and measurement, and holographic metrology. Specific topics include hybrid holographic computer image processing, a speckle method of flow velocity measurement, the measurement of vibratory strains on turbine blades by speckle photography, the use of optical heterodyning and the Doppler effect in laser vibrometers and anemometers, subpicosecond dye lasers for optical metrology, and laser-beam scanning for remote control. Holographic interferometry of brittle materials is discussed, along with a system for the automatic analysis of holographic interferograms, the measurement of surface tension by holographic interferometry, nondestructive testing by means of holographic interferometry, real-time holographic interferometry of heat transfer at the surface of cold solar collectors, and the effective practical use of holography and related technologies in industry

Fractal Metrology for biogeosystems analysis

Directory of Open Access Journals (Sweden)

V. Torres-Argüelles

2010-11-01

Full Text Available The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes of this complex system. In the present research, we studied the aggregation process as self-organizing and operating near a critical point. The structural pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate" Clay and compared in terms of roughness of the gray-intensity distribution quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them measured in terms of standard deviation. Some of the applied methods are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc. while the others have been recently developed by our Group. The combination of these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM. We show the usefulness of FM for complex systems analysis through a case study of the soil's physical and chemical degradation applying the selected toolbox to describe and compare the structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

Remote laboratory for phase-aided 3D microscopic imaging and metrology

Science.gov (United States)

Wang, Meng; Yin, Yongkai; Liu, Zeyi; He, Wenqi; Li, Boqun; Peng, Xiang

2014-05-01

In this paper, the establishment of a remote laboratory for phase-aided 3D microscopic imaging and metrology is presented. Proposed remote laboratory consists of three major components, including the network-based infrastructure for remote control and data management, the identity verification scheme for user authentication and management, and the local experimental system for phase-aided 3D microscopic imaging and metrology. The virtual network computer (VNC) is introduced to remotely control the 3D microscopic imaging system. Data storage and management are handled through the open source project eSciDoc. Considering the security of remote laboratory, the fingerprint is used for authentication with an optical joint transform correlation (JTC) system. The phase-aided fringe projection 3D microscope (FP-3DM), which can be remotely controlled, is employed to achieve the 3D imaging and metrology of micro objects.

Determination of the elementary charge and the quantum metrological triangle experiment

Energy Technology Data Exchange (ETDEWEB)

Feltin, N.; Piquemal, F. [Laboratoire National de Metrologie et d' Essais (LNE), 78 - Trappes (France)

2009-06-15

The elementary charge e is of fundamental importance in physics. The determination of its value, which is closely linked to progress of the measurement techniques, started in the beginning of the twentieth century and is still on-going. Today, in the frame of the CODATA adjustment, the evaluation of the fundamental constant, e, is derived from a complex calculation and is no more related to a single experiment. But the development of single electron tunneling (SET) devices, started in the early nineties, has opened the path towards modern metrological systems as quantum current sources. Thus a new direct determination of e is possible by implementing an electron pump and the set-up of the quantum metrological triangle (QMT) in combination with the experiments linking mechanical and electrical units. Furthermore, we show how the QMT experiment can contribute to the establishment of a new system of units based on fundamental constants of physics. (authors)

Optical metrology for advanced process control: full module metrology solutions

Science.gov (United States)

Bozdog, Cornel; Turovets, Igor

2016-03-01

Optical metrology is the workhorse metrology in manufacturing and key enabler to patterning process control. Recent advances in device architecture are gradually shifting the need for process control from the lithography module to other patterning processes (etch, trim, clean, LER/LWR treatments, etc..). Complex multi-patterning integration solutions, where the final pattern is the result of multiple process steps require a step-by-step holistic process control and a uniformly accurate holistic metrology solution for pattern transfer for the entire module. For effective process control, more process "knobs" are needed, and a tighter integration of metrology with process architecture.

World wide matching of registration metrology tools of various generations

Science.gov (United States)

Laske, F.; Pudnos, A.; Mackey, L.; Tran, P.; Higuchi, M.; Enkrich, C.; Roeth, K.-D.; Schmidt, K.-H.; Adam, D.; Bender, J.

2008-10-01

Turn around time/cycle time is a key success criterion in the semiconductor photomask business. Therefore, global mask suppliers typically allocate work loads based on fab capability and utilization capacity. From a logistical point of view, the manufacturing location of a photomask should be transparent to the customer (mask user). Matching capability of production equipment and especially metrology tools is considered a key enabler to guarantee cross site manufacturing flexibility. Toppan, with manufacturing sites in eight countries worldwide, has an on-going program to match the registration metrology systems of all its production sites. This allows for manufacturing flexibility and risk mitigation.In cooperation with Vistec Semiconductor Systems, Toppan has recently completed a program to match the Vistec LMS IPRO systems at all production sites worldwide. Vistec has developed a new software feature which allows for significantly improved matching of LMS IPRO(x) registration metrology tools of various generations. We will report on the results of the global matching campaign of several of the leading Toppan sites.

SAQP pitch walk metrology using single target metrology

Science.gov (United States)

Fang, Fang; Herrera, Pedro; Kagalwala, Taher; Camp, Janay; Vaid, Alok; Pandev, Stilian; Zach, Franz

2017-03-01

Self-aligned quadruple patterning (SAQP) processes have found widespread acceptance in advanced technology nodes to drive device scaling beyond the resolution limitations of immersion scanners. Of the four spaces generated in this process from one lithography pattern two tend to be equivalent as they are derived from the first spacer deposition. The three independent spaces are commonly labelled as α, β and γ. α, β and γ are controlled by multiple process steps including the initial lithographic patterning process, the two mandrel and spacer etches as well as the two spacer depositions. Scatterometry has been the preferred metrology approach, however is restricted to repetitive arrays. In these arrays independent measurements, in particular of alpha and gamma, are not possible due to degeneracy of the standard array targets. . In this work we present a single target approach which lifts the degeneracies commonly encountered while using product relevant layout geometries. We will first describe the metrology approach which includes the previously described SRM (signal response metrology) combined with reference data derived from CD SEM data. The performance of the methodology is shown in figures 1-3. In these figures the optically determined values for alpha, beta and gamma are compared to the CD SEM reference data. The variations are achieved using controlled process experiments varying Mandrel CD and Spacer deposition thicknesses.

The future of 2D metrology for display manufacturing

Science.gov (United States)

Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

2016-10-01

The race to 800 PPI and higher in mobile devices and the transition to OLED displays are driving a dramatic development of mask quality: resolution, CDU, registration, and complexity. 2D metrology for large area masks is necessary and must follow the roadmap. Driving forces in the market place point to continued development of even more dense displays. State-of-the-art metrology has proven itself capable of overlay below 40 nm and registration below 65 nm for G6 masks. Future developments include incoming and recurrent measurements of pellicalized masks at the panel maker's factory site. Standardization of coordinate systems across supplier networks is feasible. This will enable better yield and production economy for both mask and panel maker. Better distortion correction methods will give better registration on the panels and relax the flatness requirements of the mask blanks. If panels are measured together with masks and the results are used to characterize the aligners, further quality and yield improvements are possible. Possible future developments include in-cell metrology and integration with other instruments in the same platform.

Metrological challenges introduced by new tolerancing standards

International Nuclear Information System (INIS)

Morse, Edward; Peng, Yue; Srinivasan, Vijay; Shakarji, Craig

2014-01-01

The recent release of ISO 14405-1 has provided designers with a richer set of specification tools for the size of part features, so that various functional requirements can be captured with greater fidelity. However, these tools also bring new challenges and pitfalls to an inspector using a coordinate metrology system. A sampling strategy that might have worked well in the past could lead to erroneous results that go undetected when used to evaluate these new specifications. In this paper we investigate how measurement strategies for sampled coordinate metrology systems influence different algorithms for the evaluation of these new specifications. Of particular interest are those specifications where the order statistics of feature cross-sections are required. Here the inspector must decide not only how many points are required for an individual cross-section, but the number and spacing of cross-sections measured on the feature. The results of these decisions are compared with an analytic estimate of the ‘true value’ of the measurand specified using this new standard. (paper)

Coupling of relative intensity noise and pathlength noise to the length measurement in the optical metrology system of LISA Pathfinder

Science.gov (United States)

Wittchen, Andreas; the LPF Collaboration

2017-05-01

LISA Pathfinder is a technology demonstration mission for the space-based gravitational wave observatory, LISA. It demonstrated that the performance requirements for the interferometric measurement of two test masses in free fall can be met. An important part of the data analysis is to identify the limiting noise sources. [1] This measurement is performed with heterodyne interferometry. The performance of this optical metrology system (OMS) at high frequencies is limited by sensing noise. One such noise source is Relative Intensity Noise (RIN). RIN is a property of the laser, and the photodiode current generated by the interferometer signal contains frequency dependant RIN. From this electric signal the phasemeter calculates the phase change and laser power, and the coupling of RIN into the measurement signal depends on the noise frequency. RIN at DC, at the heterodyne frequency and at two times the heterodyne frequency couples into the phase. Another important noise at high frequencies is path length noise. To reduce the impact this noise is suppressed with a control loop. Path length noise not suppressed will couple directly into the length measurement. The subtraction techniques of both noise sources depend on the phase difference between the reference signal and the measurement signal, and thus on the test mass position. During normal operations we position the test mass at the interferometric zero, which is optimal for noise subtraction purposes. This paper will show results from an in-flight experiment where the test mass position was changed to make the position dependant noise visible.

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians

Science.gov (United States)

Pang, Shengshi; Jordan, Andrew N.

2017-01-01

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case. PMID:28276428

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians.

Science.gov (United States)

Pang, Shengshi; Jordan, Andrew N

2017-03-09

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T 2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T 4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case.

Inline temperature compensation for dimensional metrology of polymer parts in a production environment based on 3D thermomechanical analysis

DEFF Research Database (Denmark)

Sonne, M. R.; Gonzalez, D.; Costa, G. Dalla

2018-01-01

Abstract In the present work a new method for thermal compensation in dimensional metrology of polymer parts in a production environment based on 3D thermomechanical simulations is developed. A fixture for measuring the length dimension of a classical polymer part is placed in a production enviro...

Fluid-flow-rate metrology: laboratory uncertainties and traceabilities

Science.gov (United States)

Mattingly, G. E.

1991-03-01

Increased concerns for improved fluid flowrate measurement are driving the fluid metering community-meter manufacturers and users alike-to search for better verification and documentation for their fluid measurements. These concerns affect both our domestic and international market places they permeate our technologies - aerospace chemical processes automotive bioengineering etc. They involve public health and safety and they impact our national defense. These concerns are based upon the rising value of fluid resources and products and the importance of critical material accountability. These values directly impact the accuracy needs of fluid buyers and sellers in custody transfers. These concerns impact the designers and operators of chemical process systems where control and productivity optimization depend critically upon measurement precision. Public health and safety depend upon the quality of numerous pollutant measurements - both liquid and gaseous. The performance testing of engines - both automotive and aircraft are critically based upon accurate fuel measurements - both liquid and oxidizer streams. Fluid flowrate measurements are established differently from counterparts in length and mass measurement systems because these have the benefits of " identity" standards. For rate measurement systems the metrology is based upon " derived standards" . These use facilities and transfer standards which are designed built characterized and used to constitute basic measurement capabilities and quantify performance - accuracy and precision. Because " identity standards" do not exist for flow measurements facsimiles or equivalents must

Metrological Reliability of Medical Devices

Science.gov (United States)

Costa Monteiro, E.; Leon, L. F.

2015-02-01

The prominent development of health technologies of the 20th century triggered demands for metrological reliability of physiological measurements comprising physical, chemical and biological quantities, essential to ensure accurate and comparable results of clinical measurements. In the present work, aspects concerning metrological reliability in premarket and postmarket assessments of medical devices are discussed, pointing out challenges to be overcome. In addition, considering the social relevance of the biomeasurements results, Biometrological Principles to be pursued by research and innovation aimed at biomedical applications are proposed, along with the analysis of their contributions to guarantee the innovative health technologies compliance with the main ethical pillars of Bioethics.

Improving automated 3D reconstruction methods via vision metrology

Science.gov (United States)

Toschi, Isabella; Nocerino, Erica; Hess, Mona; Menna, Fabio; Sargeant, Ben; MacDonald, Lindsay; Remondino, Fabio; Robson, Stuart

2015-05-01

This paper aims to provide a procedure for improving automated 3D reconstruction methods via vision metrology. The 3D reconstruction problem is generally addressed using two different approaches. On the one hand, vision metrology (VM) systems try to accurately derive 3D coordinates of few sparse object points for industrial measurement and inspection applications; on the other, recent dense image matching (DIM) algorithms are designed to produce dense point clouds for surface representations and analyses. This paper strives to demonstrate a step towards narrowing the gap between traditional VM and DIM approaches. Efforts are therefore intended to (i) test the metric performance of the automated photogrammetric 3D reconstruction procedure, (ii) enhance the accuracy of the final results and (iii) obtain statistical indicators of the quality achieved in the orientation step. VM tools are exploited to integrate their main functionalities (centroid measurement, photogrammetric network adjustment, precision assessment, etc.) into the pipeline of 3D dense reconstruction. Finally, geometric analyses and accuracy evaluations are performed on the raw output of the matching (i.e. the point clouds) by adopting a metrological approach. The latter is based on the use of known geometric shapes and quality parameters derived from VDI/VDE guidelines. Tests are carried out by imaging the calibrated Portable Metric Test Object, designed and built at University College London (UCL), UK. It allows assessment of the performance of the image orientation and matching procedures within a typical industrial scenario, characterised by poor texture and known 3D/2D shapes.

Automated Micro Hall Effect measurements

DEFF Research Database (Denmark)

Petersen, Dirch Hjorth; Henrichsen, Henrik Hartmann; Lin, Rong

2014-01-01

With increasing complexity of processes and variety of materials used for semiconductor devices, stringent control of the electronic properties is becoming ever more relevant. Collinear micro four-point probe (M4PP) based measurement systems have become high-end metrology methods for characteriza......With increasing complexity of processes and variety of materials used for semiconductor devices, stringent control of the electronic properties is becoming ever more relevant. Collinear micro four-point probe (M4PP) based measurement systems have become high-end metrology methods...

7th International Workshop on Advanced Optical Imaging and Metrology

CERN Document Server

2014-01-01

In continuation of the FRINGE Workshop Series this Proceeding contains all contributions presented at the 7. International Workshop on Advanced Optical Imaging and Metrology. The FRINGE Workshop Series is dedicated to the presentation, discussion and dissemination of recent results in Optical Imaging and Metrology. Topics of particular interest for the 7. Workshop are: - New methods and tools for the generation, acquisition, processing, and evaluation of data in Optical Imaging and Metrology (digital wavefront engineering, computational imaging, model-based reconstruction, compressed sensing, inverse problems solution) - Application-driven technologies in Optical Imaging and Metrology (high-resolution, adaptive, active, robust, reliable, flexible, in-line, real-time) - High-dynamic range solutions in Optical Imaging and Metrology (from macro to nano) - Hybrid technologies in Optical Imaging and Metrology (hybrid optics, sensor and data fusion, model-based solutions, multimodality) - New optical sensors, imagi...

Metrology and properties of engineering surfaces

CERN Document Server

Greenwood, J; Chetwynd, D

2001-01-01

Metrology and Properties of Engineering Surfaces provides in a single volume a comprehensive and authoritative treatment of the crucial topics involved in the metrology and properties of engineering surfaces. The subject matter is a central issue in manufacturing technology, since the quality and reliability of manufactured components depend greatly upon the selection and qualities of the appropriate materials as ascertained through measurement. The book can in broad terms be split into two parts; the first deals with the metrology of engineering surfaces and covers the important issues relating to the measurement and characterization of surfaces in both two and three dimensions. This covers topics such as filtering, power spectral densities, autocorrelation functions and the use of Fractals in topography. A significant proportion is dedicated to the calibration of scanning probe microscopes using the latest techniques. The remainder of the book deals with the properties of engineering surfaces and covers a w...

Emerging technology for astronomical optics metrology

Science.gov (United States)

Trumper, Isaac; Jannuzi, Buell T.; Kim, Dae Wook

2018-05-01

Next generation astronomical optics will enable science discoveries across all fields and impact the way we perceive the Universe in which we live. To build these systems, optical metrology tools have been developed that push the boundary of what is possible. We present a summary of a few key metrology technologies that we believe are critical for the coming generation of optical surfaces.

Beyond the GUM: variance-based sensitivity analysis in metrology

International Nuclear Information System (INIS)

Lira, I

2016-01-01

Variance-based sensitivity analysis is a well established tool for evaluating the contribution of the uncertainties in the inputs to the uncertainty in the output of a general mathematical model. While the literature on this subject is quite extensive, it has not found widespread use in metrological applications. In this article we present a succinct review of the fundamentals of sensitivity analysis, in a form that should be useful to most people familiarized with the Guide to the Expression of Uncertainty in Measurement (GUM). Through two examples, it is shown that in linear measurement models, no new knowledge is gained by using sensitivity analysis that is not already available after the terms in the so-called ‘law of propagation of uncertainties’ have been computed. However, if the model behaves non-linearly in the neighbourhood of the best estimates of the input quantities—and if these quantities are assumed to be statistically independent—sensitivity analysis is definitely advantageous for gaining insight into how they can be ranked according to their importance in establishing the uncertainty of the measurand. (paper)

Metrology in Pharmaceutical Industry - A Case Study

International Nuclear Information System (INIS)

Yuvamoto, Priscila D.; Fermam, Ricardo K. S.; Nascimento, Elizabeth S.

2016-01-01

Metrology is recognized by improving production process, increasing the productivity, giving more reliability to the measurements and consequently, it impacts in the economy of a country. Pharmaceutical area developed GMP (Good Manufacture Practice) requeriments, with no introduction of metrological concepts. However, due to Nanomedicines, it is expected this approach and the consequent positive results. The aim of this work is to verify the level of metrology implementation in a Brazilian pharmaceutical industry, using a case study. The purpose is a better mutual comprehension by both areas, acting together and governmental support to robustness of Brazilian pharmaceutical area. (paper)

Aerosol metrology: aerodynamic and electrostatic techniques

International Nuclear Information System (INIS)

Prodi, V.

1988-01-01

Aerosols play an ever increasing role in science, engineering and especially in industrial and environmental hygiene. They are being studied since a long time, but only recently the progress in aerosol instrumentation has made it possible to pose of aerosol metrology, especially the problem of absolute measurements, as based directly on measurements of fundamental quantities. On the basis of absolute measurements, the hierarchy of standards can be prepared and adequately disseminated. In the aerosol field, the quantities to be measured are mainly size, charge, density, and shape. In this paper a possible standardisation framework for aerosols is proposed, for the main physical quantities

A magnetic suspension system for measuring liquid density

Directory of Open Access Journals (Sweden)

Luz María Centeno González

2013-01-01

Full Text Available Density is a derived quantity of mass and length; it is defined as mass per volume unit and its SI unit is kg/m3. National metrology institutes have been designing and building their own magnetic suspension systems during the last 5 decades for making fluid density measurements; this has allowed them to carry out research into liquids and gases’ physical characteristics. This paper was aimed at designing and developing a magnetic suspension system for a magnetic balance used in determining liquid density to be used in CENAM’s metrology density laboratories.

TSOM method for semiconductor metrology

Science.gov (United States)

Attota, Ravikiran; Dixson, Ronald G.; Kramar, John A.; Potzick, James E.; Vladár, András E.; Bunday, Benjamin; Novak, Erik; Rudack, Andrew

2011-03-01

Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry, scanning electron microscopy (SEM), and atomic force microscopy (AFM). TSOM can be used in both reflection and transmission modes and is applicable to a variety of target materials and shapes. Nanometrology applications that have been demonstrated by experiments or simulations include defect analysis, inspection and process control; critical dimension, photomask, overlay, nanoparticle, thin film, and 3D interconnect metrologies; line-edge roughness measurements; and nanoscale movements of parts in MEMS/NEMS. Industries that could benefit include semiconductor, data storage, photonics, biotechnology, and nanomanufacturing. TSOM is relatively simple and inexpensive, has a high throughput, and provides nanoscale sensitivity for 3D measurements with potentially significant savings and yield improvements in manufacturing.

Nanoelectronics: Metrology and Computation

International Nuclear Information System (INIS)

Lundstrom, Mark; Clark, Jason V.; Klimeck, Gerhard; Raman, Arvind

2007-01-01

Research in nanoelectronics poses new challenges for metrology, but advances in theory, simulation and computing and networking technology provide new opportunities to couple simulation and metrology. This paper begins with a brief overview of current work in computational nanoelectronics. Three examples of how computation can assist metrology will then be discussed. The paper concludes with a discussion of how cyberinfrastructure can help connect computing and metrology using the nanoHUB (www.nanoHUB.org) as a specific example

Metrological issues related to BRDF measurements around the specular direction in the particular case of glossy surfaces

Science.gov (United States)

Obein, Gaël.; Audenaert, Jan; Ged, Guillaume; Leloup, Frédéric B.

2015-03-01

Among the complete bidirectional reflectance distribution function (BRDF), visual gloss is principally related to physical reflection characteristics located around the specular reflection direction. This particular part of the BRDF is usually referred to as the specular peak. A good starting point for the physical description of gloss could be to measure the reflection properties around this specular peak. Unfortunately, such a characterization is not trivial, since for glossy surfaces the width of the specular peak can become very narrow (typically a full width at half maximum inferior to 0.5° is encountered). In result, new BRDF measurement devices with a very small solid angle of detection are being introduced. Yet, differences in the optical design of BRDF measurement instruments engender different measurement results for the same specimen, complicating direct comparison of the measurement results. This issue is addressed in this paper. By way of example, BRDF measurement results of two samples, one being matte and the other one glossy, obtained by use of two high level goniospectrophotometers with a different optical design, are described. Important discrepancies in the results of the glossy sample are discussed. Finally, luminance maps obtained from renderings with the acquired BRDF data are presented, exemplifying the large visual differences that might be obtained. This stresses the metrological aspects that must be known for using BRDF data. Indeed, the comprehension of parameters affecting the measurement results is an inevitable step towards progress in the metrology of surface gloss, and thus towards a better metrology of appearance in general.

Slovak Office of Standards, Metrology and Testing. Annual Report 2001

International Nuclear Information System (INIS)

2002-01-01

A brief account of activities carried out by the Slovak Office of Standards, Metrology and Testing of the Slovak Republic in 2001 is presented. These activities are reported under the headings: (1) Introduction by the President of the Slovak Office of Standards, Metrology and Testing; (2) The Vice-president's Unit Standardization and Quality; (3) The President's Office; (4) Chief Inspector Department; (5) Legislative-juridical Department; (6) Department of Economy; (7) Department of International Co-operation; (8) Department of European Integration; (9) Department of Metrology; (10) Department of Testing; (11) Department of the Cyclotron Centre SR; (12) Slovak Institute of Metrology; (13) Slovak Standards Institution; (14) Slovak Metrology Inspectorate; (15) Slovak Legal Metrology; (16) Measuring Techniques - Technocentre - MTT; Abbreviations; (17) Technical Testing Institute Piestany; (18) Testing Institute of Transport and Earthmoving Machinery - SUDST

Speckle-based portable device for in-situ metrology of x-ray mirrors at Diamond Light Source

Science.gov (United States)

Wang, Hongchang; Kashyap, Yogesh; Zhou, Tunhe; Sawhney, Kawal

2017-09-01

For modern synchrotron light sources, the push toward diffraction-limited and coherence-preserved beams demands accurate metrology on X-ray optics. Moreover, it is important to perform in-situ characterization and optimization of X-ray mirrors since their ultimate performance is critically dependent on the working conditions. Therefore, it is highly desirable to develop a portable metrology device, which can be easily implemented on a range of beamlines for in-situ metrology. An X-ray speckle-based portable device for in-situ metrology of synchrotron X-ray mirrors has been developed at Diamond Light Source. Ultra-high angular sensitivity is achieved by scanning the speckle generator in the X-ray beam. In addition to the compact setup and ease of implementation, a user-friendly graphical user interface has been developed to ensure that characterization and alignment of X-ray mirrors is simple and fast. The functionality and feasibility of this device is presented with representative examples.

Parametric boundary reconstruction algorithm for industrial CT metrology application.

Science.gov (United States)

Yin, Zhye; Khare, Kedar; De Man, Bruno

2009-01-01

High-energy X-ray computed tomography (CT) systems have been recently used to produce high-resolution images in various nondestructive testing and evaluation (NDT/NDE) applications. The accuracy of the dimensional information extracted from CT images is rapidly approaching the accuracy achieved with a coordinate measuring machine (CMM), the conventional approach to acquire the metrology information directly. On the other hand, CT systems generate the sinogram which is transformed mathematically to the pixel-based images. The dimensional information of the scanned object is extracted later by performing edge detection on reconstructed CT images. The dimensional accuracy of this approach is limited by the grid size of the pixel-based representation of CT images since the edge detection is performed on the pixel grid. Moreover, reconstructed CT images usually display various artifacts due to the underlying physical process and resulting object boundaries from the edge detection fail to represent the true boundaries of the scanned object. In this paper, a novel algorithm to reconstruct the boundaries of an object with uniform material composition and uniform density is presented. There are three major benefits in the proposed approach. First, since the boundary parameters are reconstructed instead of image pixels, the complexity of the reconstruction algorithm is significantly reduced. The iterative approach, which can be computationally intensive, will be practical with the parametric boundary reconstruction. Second, the object of interest in metrology can be represented more directly and accurately by the boundary parameters instead of the image pixels. By eliminating the extra edge detection step, the overall dimensional accuracy and process time can be improved. Third, since the parametric reconstruction approach shares the boundary representation with other conventional metrology modalities such as CMM, boundary information from other modalities can be directly

Capability Handbook- offline metrology

DEFF Research Database (Denmark)

Islam, Aminul; Marhöfer, David Maximilian; Tosello, Guido

This offline metrological capability handbook has been made in relation to HiMicro Task 3.3. The purpose of this document is to assess the metrological capability of the HiMicro partners and to gather the information of all available metrological instruments in the one single document. It provides...

Phase shifting white light interferometry using colour CCD for optical metrology and bio-imaging applications

Science.gov (United States)

Upputuri, Paul Kumar; Pramanik, Manojit

2018-02-01

Phase shifting white light interferometry (PSWLI) has been widely used for optical metrology applications because of their precision, reliability, and versatility. White light interferometry using monochrome CCD makes the measurement process slow for metrology applications. WLI integrated with Red-Green-Blue (RGB) CCD camera is finding imaging applications in the fields optical metrology and bio-imaging. Wavelength dependent refractive index profiles of biological samples were computed from colour white light interferograms. In recent years, whole-filed refractive index profiles of red blood cells (RBCs), onion skin, fish cornea, etc. were measured from RGB interferograms. In this paper, we discuss the bio-imaging applications of colour CCD based white light interferometry. The approach makes the measurement faster, easier, cost-effective, and even dynamic by using single fringe analysis methods, for industrial applications.

Metrology for ITER Assembly

International Nuclear Information System (INIS)

Bogusch, E.

2006-01-01

The overall dimensions of the ITER Tokamak and the particular assembly sequence preclude the use of conventional optical metrology, mechanical jigs and traditional dimensional control equipment, as used for the assembly of smaller, previous generation, fusion devices. This paper describes the state of the art of the capabilities of available metrology systems, with reference to the previous experience in Fusion engineering and in other industries. Two complementary procedures of transferring datum from the primary datum network on the bioshield to the secondary datum s inside the VV with the desired accuracy of about 0.1 mm is described, one method using the access directly through the ports and the other using transfer techniques, developed during the co-operation with ITER/EFDA. Another important task described is the development of a method for the rapid and easy measurement of the gaps between sectors, required for the production of the customised splice plates between them. The scope of the paper includes the evaluation of the composition and cost of the systems and team of technical staff required to meet the requirements of the assembly procedure. The results from a practical, full-scale demonstration of the methodologies used, using the proposed equipment, is described. This work has demonstrated the feasibility of achieving the necessary accuracies for the successful building of ITER. (author)

Color and appearance metrology facility

Data.gov (United States)

Federal Laboratory Consortium — The NIST Physical Measurement Laboratory has established the color and appearance metrology facility to support calibration services for 0°/45° colored samples, 20°,...

Differential Evolution for Many-Particle Adaptive Quantum Metrology

NARCIS (Netherlands)

Lovett, N.B.; Crosnier, C.; Perarnau- Llobet, M.; Sanders, B.

2013-01-01

We devise powerful algorithms based on differential evolution for adaptive many-particle quantum metrology. Our new approach delivers adaptive quantum metrology policies for feedback control that are orders-of-magnitude more efficient and surpass the few-dozen-particle limitation arising in methods

Radiation protection metrology in Austria: status and needs in a European perspective

International Nuclear Information System (INIS)

Maringer, F. J.; Leitner, A.; Tschurlovits, M.

2005-01-01

A global harmonised system of radiation protection and radiation dosimetry metrology is required to assure quality and accuracy in exchange of ideas, science, technologies and products. Accurate and high-grade measurements of ionising radiation are required in a wide range of industrial and medical applications where they are critical for human health and safety. This paper presents current work of international and Austrian metrological institutions in the field of ionising radiation and briefly discusses the future need and perspectives in the European context.(author)

Radionuclide metrology research for nuclear site decommissioning

Science.gov (United States)

Judge, S. M.; Regan, P. H.

2017-11-01

The safe and cost-effective decommissioning of legacy nuclear sites relies on accurate measurement of the radioactivity content of the waste materials, so that the waste can be assigned to the most appropriate disposal route. Such measurements are a new challenge for the science of radionuclide metrology which was established largely to support routine measurements on operating nuclear sites and other applications such as nuclear medicine. In this paper, we provide a brief summary of the international measurement system that is established to enable nuclear site operators to demonstrate that measurements are accurate, independent and fit for purpose, and highlight some of the projects that are underway to adapt the measurement system to meet the changing demands from the industry.

Multispectral calibration to enhance the metrology performance of C-mount camera systems

Directory of Open Access Journals (Sweden)

S. Robson

2014-06-01

Full Text Available Low cost monochrome camera systems based on CMOS sensors and C-mount lenses have been successfully applied to a wide variety of metrology tasks. For high accuracy work such cameras are typically equipped with ring lights to image retro-reflective targets as high contrast image features. Whilst algorithms for target image measurement and lens modelling are highly advanced, including separate RGB channel lens distortion correction, target image circularity compensation and a wide variety of detection and centroiding approaches, less effort has been directed towards optimising physical target image quality by considering optical performance in narrow wavelength bands. This paper describes an initial investigation to assess the effect of wavelength on camera calibration parameters for two different camera bodies and the same ‘C-mount’ wide angle lens. Results demonstrate the expected strong influence on principal distance, radial and tangential distortion, and also highlight possible trends in principal point, orthogonality and affinity parameters which are close to the parameter estimation noise level from the strong convergent self-calibrating image networks.

CD-SEM real time bias correction using reference metrology based modeling

Science.gov (United States)

Ukraintsev, V.; Banke, W.; Zagorodnev, G.; Archie, C.; Rana, N.; Pavlovsky, V.; Smirnov, V.; Briginas, I.; Katnani, A.; Vaid, A.

2018-03-01

Accuracy of patterning impacts yield, IC performance and technology time to market. Accuracy of patterning relies on optical proximity correction (OPC) models built using CD-SEM inputs and intra die critical dimension (CD) control based on CD-SEM. Sub-nanometer measurement uncertainty (MU) of CD-SEM is required for current technologies. Reported design and process related bias variation of CD-SEM is in the range of several nanometers. Reference metrology and numerical modeling are used to correct SEM. Both methods are slow to be used for real time bias correction. We report on real time CD-SEM bias correction using empirical models based on reference metrology (RM) data. Significant amount of currently untapped information (sidewall angle, corner rounding, etc.) is obtainable from SEM waveforms. Using additional RM information provided for specific technology (design rules, materials, processes) CD extraction algorithms can be pre-built and then used in real time for accurate CD extraction from regular CD-SEM images. The art and challenge of SEM modeling is in finding robust correlation between SEM waveform features and bias of CD-SEM as well as in minimizing RM inputs needed to create accurate (within the design and process space) model. The new approach was applied to improve CD-SEM accuracy of 45 nm GATE and 32 nm MET1 OPC 1D models. In both cases MU of the state of the art CD-SEM has been improved by 3x and reduced to a nanometer level. Similar approach can be applied to 2D (end of line, contours, etc.) and 3D (sidewall angle, corner rounding, etc.) cases.

Sub-atomic dimensional metrology: developments in the control of x-ray interferometers

Science.gov (United States)

Yacoot, Andrew; Kuetgens, Ulrich

2012-07-01

Within the European Metrology Research Programme funded project NANOTRACE, the nonlinearity of the next generation of optical interferometers has been measured using x-ray interferometry. The x-ray interferometer can be regarded as a ruler or translation stage whose graduations or displacement steps are based on the lattice spacing of the crystallographic planes from which the x-rays are diffracted: in this case the graduations are every 192 pm corresponding to the spacing between the (2 2 0) planes in silicon. Precise displacement of the x-ray interferometer's monolithic translation stage in steps corresponding to discrete numbers of x-ray fringes requires servo positioning capability at the picometre level. To achieve this very fine control, a digital control system has been developed which has opened up the potential for advances in metrology using x-ray interferometry that include quadrature counting of x-ray fringes.

Sub-atomic dimensional metrology: developments in the control of x-ray interferometers

International Nuclear Information System (INIS)

Yacoot, Andrew; Kuetgens, Ulrich

2012-01-01

Within the European Metrology Research Programme funded project NANOTRACE, the nonlinearity of the next generation of optical interferometers has been measured using x-ray interferometry. The x-ray interferometer can be regarded as a ruler or translation stage whose graduations or displacement steps are based on the lattice spacing of the crystallographic planes from which the x-rays are diffracted: in this case the graduations are every 192 pm corresponding to the spacing between the (2 2 0) planes in silicon. Precise displacement of the x-ray interferometer's monolithic translation stage in steps corresponding to discrete numbers of x-ray fringes requires servo positioning capability at the picometre level. To achieve this very fine control, a digital control system has been developed which has opened up the potential for advances in metrology using x-ray interferometry that include quadrature counting of x-ray fringes. (paper)

Mirror surface metrology and polishing for AXAF/TMA

International Nuclear Information System (INIS)

Slomba, A.; Babish, R.; Glenn, P.

1985-01-01

The achievement of the derived goals for mirror surface quality on the Advanced X-ray Astrophysics Facility (AXAF), Technology Mirror Assembly (TMA) required a combination of state-of-the-art metrology and polishing techniques. In this paper, the authors summarize the derived goals and cover the main facets of the various metrology instruments employed, as well as the philosophy and technique used in the polishing work. In addition, they show how progress was measured against the goals, using the detailed error budget for surface errors and a mathematical model for performance prediction. The metrology instruments represented a considerable advance on the state-of-the-art and fully satisfied the error budget goals for the various surface errors. They were capable of measuring the surface errors over a large range of spatial periods, from low-frequency figure errors to microroughness. The polishing was accomplished with a computer-controlled process, guided by the combined data from various metrology instruments. This process was also tailored to reduce the surface errors over the full range of spatial periods

Future metrology needs for FEL reflective optics

International Nuclear Information System (INIS)

Assoufid, L.

2000-01-01

An International Workshop on Metrology for X-ray and Neutron Optics has been held March 16-17, 2000, at the Advanced Photon Source, Argonne National Laboratory, near Chicago, Illinois (USA). The workshop gathered engineers and scientists from both the U.S. and around the world to evaluate metrology instrumentation and methods used to characterize surface figure and finish for long grazing incidence optics used in beamlines at synchrotrons radiation sources. This two-day workshop was motivated by the rapid evolution in the performance of x-ray and neutron sources along with requirements in optics figure and finish. More specifically, the performance of future light sources, such as free-electron laser (FEL)-based x-ray sources, is being pushed to new limits in term of both brilliance and coherence. As a consequence, tolerances on surface figure and finish of the next generation of optics are expected to become tighter. The timing of the workshop provided an excellent opportunity to study the problem, evaluate the state of the art in metrology instrumentation, and stimulate innovation on future metrology instruments and techniques to be used to characterize these optics. This paper focuses on FEL optics and metrology needs. (A more comprehensive summary of the workshop can be found elsewhere.) The performance and limitations of current metrology instrumentation will be discussed and recommendations from the workshop on future metrology development to meet the FEL challenges will be detailed

Future metrology needs for FEL reflective optics.

Energy Technology Data Exchange (ETDEWEB)

Assoufid, L.

2000-09-21

An International Workshop on Metrology for X-ray and Neutron Optics has been held March 16-17, 2000, at the Advanced Photon Source, Argonne National Laboratory, near Chicago, Illinois (USA). The workshop gathered engineers and scientists from both the U.S. and around the world to evaluate metrology instrumentation and methods used to characterize surface figure and finish for long grazing incidence optics used in beamlines at synchrotrons radiation sources. This two-day workshop was motivated by the rapid evolution in the performance of x-ray and neutron sources along with requirements in optics figure and finish. More specifically, the performance of future light sources, such as free-electron laser (FEL)-based x-ray sources, is being pushed to new limits in term of both brilliance and coherence. As a consequence, tolerances on surface figure and finish of the next generation of optics are expected to become tighter. The timing of the workshop provided an excellent opportunity to study the problem, evaluate the state of the art in metrology instrumentation, and stimulate innovation on future metrology instruments and techniques to be used to characterize these optics. This paper focuses on FEL optics and metrology needs. (A more comprehensive summary of the workshop can be found elsewhere.) The performance and limitations of current metrology instrumentation will be discussed and recommendations from the workshop on future metrology development to meet the FEL challenges will be detailed.

UPWIND 1A2 Metrology. Final Report

DEFF Research Database (Denmark)

Eecen, P.J.; Wagenaar, J.W.; Stefanatos, N.

. Since this problem covers many areas of wind energy, the work package is defined as a crosscutting activity. The objectives of the metrology work package are to develop metrology tools in wind energy to significantly enhance the quality of measurement and testing techniques. The first deliverable...... is a valuable tool for the further assessment and interest has been shown from other work packages, such as Training. This report describes the activities that have been carried out in the Work Package 1A2 Metrology of the UpWind project. Activities from Risø are described in a separate report: T.F. Pedersen...... was to perform a state of the art assessment to identify all relevant measurands. The required accuracies and required sampling frequencies have been identified from the perspective of the users of the data (the other work packages in UpWind). This work led to the definition of the Metrology Database, which...

Reference metrology in a research fab: the NIST clean calibrations thrust

Science.gov (United States)

Dixson, Ronald; Fu, Joe; Orji, Ndubuisi; Renegar, Thomas; Zheng, Alan; Vorburger, Theodore; Hilton, Al; Cangemi, Marc; Chen, Lei; Hernandez, Mike; Hajdaj, Russell; Bishop, Michael; Cordes, Aaron

2009-03-01

In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) - a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab - a 1765 m2 (19,000 ft2) clean room with 743 m2 (8000 ft2) of class 100 space - is the anchor of this facility and an integral component of the new Center for Nanoscale Science and Technology (CNST) at NIST. Although the CNST/NanoFab is a nanotechnology research facility with a different strategic focus than a current high volume semiconductor fab, metrology tools still play an important role in the nanofabrication research conducted here. Some of the metrology tools available to users of the NanoFab include stylus profiling, scanning electron microscopy (SEM), and atomic force microscopy (AFM). Since 2001, NIST has collaborated with SEMATECH to implement a reference measurement system (RMS) using critical dimension atomic force microscopy (CD-AFM). NIST brought metrology expertise to the table and SEMATECH provided access to leading edge metrology tools in their clean room facility in Austin. Now, in the newly launched "clean calibrations" thrust at NIST, we are implementing the reference metrology paradigm on several tools in the CNST/NanoFab. Initially, we have focused on calibration, monitoring, and uncertainty analysis for a three-tool set consisting of a stylus profiler, an SEM, and an AFM. Our larger goal is the development of new and supplemental calibrations and standards that will benefit from the Class 100 environment available in the NanoFab and offering our customers calibration options that do not require exposing their samples to less clean environments. Toward this end, we have completed a preliminary evaluation of the performance of these instruments. The results of these evaluations suggest that the achievable uncertainties are generally consistent with our measurement goals.

Remote Metrology, Mapping, and Motion Sensing of Plasma Facing Components Using FM Coherent Laser Radar

International Nuclear Information System (INIS)

Menon, M.M.; Barry, R.E.; Slotwinsky, A.; Kugel, H.W.; Skinner, C.H.

2000-01-01

Metrology inside a D/T burning fusion reactor must necessarily be conducted remotely since the in-vessel environment would be highly radioactive due to neutron activation of the torus walls. A technique based on frequency modulated coherent laser radar (FM CLR) for such remote metrology is described. Since the FM CLR relies on frequency shift to measure distances, the results are largely insensitive to surface reflectance characteristics. Results of measurements in TFTR and NSTX fusion devices using a prototype FM CLR unit, capable of remotely measuring distances (range) up to 22 m with better than 0.1-mm precision, are provided. These results illustrate that the FM CLR can be used for precision remote metrology as well as viewing. It is also shown that by conducting Doppler corrected range measurements using the CLR, the motion of objects can be tracked. Thus, the FM CLR has the potential to remotely measure the motion of plasma facing components (PFCs) during plasma disruptions

SPEED ROLLER STAND MEASUREMENT SYSTEM CHECKING TECHNIQUE

Directory of Open Access Journals (Sweden)

Y. Zybtsev

2011-01-01

Full Text Available The study has shown that the accuracy of brakes checking by inertial stands depends upon the applied methods of measurement of braking parameters (stand slowing down, braking distance, brakes triggering time, current speed as well as the methods of metrological checking of measuring system canals.

Conceptual design finalisation of the ITER In-Vessel Viewing and Metrology System (IVVS)

Energy Technology Data Exchange (ETDEWEB)

Dubus, Gregory, E-mail: gregory.dubus@f4e.europa.eu [Fusion for Energy, c/ Josep Pla, n°2 - Torres Diagonal Litoral - Edificio B3, 08019 Barcelona (Spain); Puiu, Adrian; Damiani, Carlo; Van Uffelen, Marco; Lo Bue, Alessandro; Izquierdo, Jesus; Semeraro, Luigi [Fusion for Energy, c/ Josep Pla, n°2 - Torres Diagonal Litoral - Edificio B3, 08019 Barcelona (Spain); Martins, Jean-Pierre; Palmer, Jim [ITER Organization, Route de Vinon sur Verdon, 13115 Saint Paul Lez Durance (France)

2013-10-15

The In-Vessel Viewing and Metrology System (IVVS) is a fundamental tool for the ITER machine operations, aiming at performing inspections as well as providing information related to the erosion of in-vessel components. Periodically or on request, the IVVS probes will be deployed into the Vacuum Vessel from their storage positions (still within the ITER primary confinement) in order to perform both viewing and metrology on plasma facing components (blanket, divertor, heating/diagnostic plugs, test blanket modules) and, more generically, to provide information on the status of the in-vessel components. In 2011, the IO proposed to simplify and strengthen the six IVVS port extensions situated at the divertor level. Among other important consequences, such as the relocation of the Glow Discharge Cleaning (GDC) electrodes at other levels of the machine, this major design change implied the need for a substantial redesign of the IVVS plug, which took part to an on-going effort to bring the integrated IVVS concept – including the scanning probe and its deployment system – to the level of maturity suitable for the Conceptual Design Review. This paper gives an overview of the various design and R and D activities in progress: plug design integration, probe concept validation under environmental conditions, development of a metrology strategy, the whole supported by a nuclear analysis.

Correlation methods in optical metrology with state-of-the-art x-ray mirrors

Science.gov (United States)

Yashchuk, Valeriy V.; Centers, Gary; Gevorkyan, Gevork S.; Lacey, Ian; Smith, Brian V.

2018-01-01

The development of fully coherent free electron lasers and diffraction limited storage ring x-ray sources has brought to focus the need for higher performing x-ray optics with unprecedented tolerances for surface slope and height errors and roughness. For example, the proposed beamlines for the future upgraded Advance Light Source, ALS-U, require optical elements characterized by a residual slope error of optics with a length of up to one meter. However, the current performance of x-ray optical fabrication and metrology generally falls short of these requirements. The major limitation comes from the lack of reliable and efficient surface metrology with required accuracy and with reasonably high measurement rate, suitable for integration into the modern deterministic surface figuring processes. The major problems of current surface metrology relate to the inherent instrumental temporal drifts, systematic errors, and/or an unacceptably high cost, as in the case of interferometry with computer-generated holograms as a reference. In this paper, we discuss the experimental methods and approaches based on correlation analysis to the acquisition and processing of metrology data developed at the ALS X-Ray Optical Laboratory (XROL). Using an example of surface topography measurements of a state-of-the-art x-ray mirror performed at the XROL, we demonstrate the efficiency of combining the developed experimental correlation methods to the advanced optimal scanning strategy (AOSS) technique. This allows a significant improvement in the accuracy and capacity of the measurements via suppression of the instrumental low frequency noise, temporal drift, and systematic error in a single measurement run. Practically speaking, implementation of the AOSS technique leads to an increase of the measurement accuracy, as well as the capacity of ex situ metrology by a factor of about four. The developed method is general and applicable to a broad spectrum of high accuracy measurements.

Performance-based gear metrology kinematic, transmission, error computation and diagnosis

CERN Document Server

Mark, William D

2012-01-01

A mathematically rigorous explanation of how manufacturing deviations and damage on the working surfaces of gear teeth cause transmission-error contributions to vibration excitations Some gear-tooth working-surface manufacturing deviations of significant amplitude cause negligible vibration excitation and noise, yet others of minuscule amplitude are a source of significant vibration excitation and noise.   Presently available computer-numerically-controlled dedicated gear metrology equipment can measure such error patterns on a gear in a few hours in sufficient detail to enable

Metrological assessment of the methods for measuring the contents of acids and ion metals responsible for the exchangeable acidity of soils

Science.gov (United States)

Vanchikova, E. V.; Shamrikova, E. V.; Bespyatykh, N. V.; Kyz"yurova, E. V.; Kondratenok, B. M.

2015-02-01

Metrological characteristics—precision, trueness, and accuracy—of the results of measurements of the exchangeable acidity and its components by the potentiometric titration method were studied on the basis of multiple analyses of the soil samples with the examination of statistical data for the outliers and their correspondence to the normal distribution. Measurement errors were estimated. The applied method was certified by the Metrological Center of the Uralian Branch of the Russian Academy of Sciences (certificate no. 88-17641-094-2013) and included in the Federal Information Fund on Assurance of Measurements (FR 1.31.2013.16382).

Development of laser materials processing and laser metrology techniques

International Nuclear Information System (INIS)

Kim, Cheol Jung; Chung, Chin Man; Kim, Jeong Mook; Kim, Min Suk; Kim, Kwang Suk; Baik, Sung Hoon; Kim, Seong Ouk; Park, Seung Kyu

1997-09-01

The applications of remote laser materials processing and metrology have been investigated in nuclear industry from the beginning of laser invention because they can reduce the risks of workers in the hostile environment by remote operation. The objective of this project is the development of laser material processing and metrology techniques for repairing and inspection to improve the safety of nuclear power plants. As to repairing, we developed our own laser sleeve welding head and innovative optical laser weld monitoring techniques to control the sleeve welding process. Furthermore, we designed and fabricated a 800 W Nd:YAG and a 150 W Excimer laser systems for high power laser materials processing in nuclear industry such as cladding and decontamination. As to inspection, we developed an ESPI and a laser triangulation 3-D profile measurement system for defect detection which can complement ECT and UT inspections. We also developed a scanning laser vibrometer for remote vibration measurement of large structures and tested its performance. (author). 58 refs., 16 tabs., 137 figs

Metrological assurance and traceability for Industry 4.0 and additive manufacturing in Ukraine

Science.gov (United States)

Skliarov, Volodymyr; Neyezhmakov, Pavel; Prokopov, Alexander

2018-03-01

The national measurement standards from the point of view of traceability of the results of measurement in additive manufacturing in Ukraine are considered in the paper. The metrological characteristics of the national primary measurement standards in the field of geometric, temperature, optical-physical and time-frequency measurements, which took part in international comparisons within COOMET projects, are presented. The accurate geometric, temperature, optical-physical and time-frequency measurements are the key ones in controlling the quality of additive manufacturing. The use of advanced CAD/CAE/CAM systems allows to simulate the process of additive manufacturing at each stage. In accordance with the areas of the technology of additive manufacturing, the ways of improving the national measurement standards of Ukraine for the growing needs of metrology of additive manufacturing are considered.

Activities of the IPEN laboratory (CNEN/SP - Brazil) of nuclear metrology

International Nuclear Information System (INIS)

Dias, M.S.; Koskinas, M.F.; Pocobi, E.; Silva, C.A.M.; Machado, R.R.

1987-01-01

The determination of radionuclide activity for radioactive sources and standardized solutions is reported as the main purpose of the IPEN laboratory of nuclear metrology. The measurement systems installed in the laboratory, the measurable activity intervals and some of the standardized radionuclides (emphasizing the ones used in nuclear medicine) are presented. (M.A.C.) [pt

Metrological challenges for measurements of key climatological observables: oceanic salinity and pH, and atmospheric humidity. Part 1: overview

Science.gov (United States)

Feistel, R.; Wielgosz, R.; Bell, S. A.; Camões, M. F.; Cooper, J. R.; Dexter, P.; Dickson, A. G.; Fisicaro, P.; Harvey, A. H.; Heinonen, M.; Hellmuth, O.; Kretzschmar, H.-J.; Lovell-Smith, J. W.; McDougall, T. J.; Pawlowicz, R.; Ridout, P.; Seitz, S.; Spitzer, P.; Stoica, D.; Wolf, H.

2016-02-01

Water in its three ambient phases plays the central thermodynamic role in the terrestrial climate system. Clouds control Earth’s radiation balance, atmospheric water vapour is the strongest ‘greenhouse’ gas, and non-equilibrium relative humidity at the air-sea interface drives evaporation and latent heat export from the ocean. On climatic time scales, melting ice caps and regional deviations of the hydrological cycle result in changes of seawater salinity, which in turn may modify the global circulation of the oceans and their ability to store heat and to buffer anthropogenically produced carbon dioxide. In this paper, together with three companion articles, we examine the climatologically relevant quantities ocean salinity, seawater pH and atmospheric relative humidity, noting fundamental deficiencies in the definitions of those key observables, and their lack of secure foundation on the International System of Units, the SI. The metrological histories of those three quantities are reviewed, problems with their current definitions and measurement practices are analysed, and options for future improvements are discussed in conjunction with the recent seawater standard TEOS-10. It is concluded that the International Bureau of Weights and Measures, BIPM, in cooperation with the International Association for the Properties of Water and Steam, IAPWS, along with other international organizations and institutions, can make significant contributions by developing and recommending state-of-the-art solutions for these long standing metrological problems in climatology.

Simulation-based artifact correction (SBAC) for metrological computed tomography

Science.gov (United States)

Maier, Joscha; Leinweber, Carsten; Sawall, Stefan; Stoschus, Henning; Ballach, Frederic; Müller, Tobias; Hammer, Michael; Christoph, Ralf; Kachelrieß, Marc

2017-06-01

Computed tomography (CT) is a valuable tool for the metrolocical assessment of industrial components. However, the application of CT to the investigation of highly attenuating objects or multi-material components is often restricted by the presence of CT artifacts caused by beam hardening, x-ray scatter, off-focal radiation, partial volume effects or the cone-beam reconstruction itself. In order to overcome this limitation, this paper proposes an approach to calculate a correction term that compensates for the contribution of artifacts and thus enables an appropriate assessment of these components using CT. Therefore, we make use of computer simulations of the CT measurement process. Based on an appropriate model of the object, e.g. an initial reconstruction or a CAD model, two simulations are carried out. One simulation considers all physical effects that cause artifacts using dedicated analytic methods as well as Monte Carlo-based models. The other one represents an ideal CT measurement i.e. a measurement in parallel beam geometry with a monochromatic, point-like x-ray source and no x-ray scattering. Thus, the difference between these simulations is an estimate for the present artifacts and can be used to correct the acquired projection data or the corresponding CT reconstruction, respectively. The performance of the proposed approach is evaluated using simulated as well as measured data of single and multi-material components. Our approach yields CT reconstructions that are nearly free of artifacts and thereby clearly outperforms commonly used artifact reduction algorithms in terms of image quality. A comparison against tactile reference measurements demonstrates the ability of the proposed approach to increase the accuracy of the metrological assessment significantly.

Interoperability: linking design and tolerancing with metrology.

Science.gov (United States)

Morse, Edward; Heysiattalab, Saeed; Barnard-Feeney, Allison; Hedberg, Thomas

2016-01-01

On October 30, 2014 the American National Standards Institute (ANSI) approved QIF v 2.0 (Quality Information Framework, version 2.0) as an American National Standard. Subsequently in early 2016 QIF version 2.1 was approved. This paper describes how the QIF standard models the information necessary for quality workflow across the full metrology enterprise. After a brief description of the XML 'language' used in the standard, the paper reports on how the standard enables information exchange among four major activities in the metrology enterprise (product definition; measurement planning; measurement execution; and the analysis and reporting of the quality data).

Scientific language and metrology; El lenguaje cientificio y la metrologia

Energy Technology Data Exchange (ETDEWEB)

Campo Maldonado, D. del; Martin Blasco, B.; Prieto Esteban, E.

2011-07-01

The International System of Units (SI) reflects all the decisions and recommendations regarding units of measurement issued by the General Conference on Weights and Measures, including rules for writing the names and symbols of measurement units and for expressing the values of quantities. Even though the SI is internationally accepted and is the declared legal system whose use is obligatory in Spain, the Spanish Metrology Centre has been detecting an incorrect use of the units of measurement both in textbooks at all levels and in scientific articles. (Author) 5 refs.

Statistical metrology - measurement and modeling of variation for advanced process development and design rule generation

International Nuclear Information System (INIS)

Boning, Duane S.; Chung, James E.

1998-01-01

Advanced process technology will require more detailed understanding and tighter control of variation in devices and interconnects. The purpose of statistical metrology is to provide methods to measure and characterize variation, to model systematic and random components of that variation, and to understand the impact of variation on both yield and performance of advanced circuits. Of particular concern are spatial or pattern-dependencies within individual chips; such systematic variation within the chip can have a much larger impact on performance than wafer-level random variation. Statistical metrology methods will play an important role in the creation of design rules for advanced technologies. For example, a key issue in multilayer interconnect is the uniformity of interlevel dielectric (ILD) thickness within the chip. For the case of ILD thickness, we describe phases of statistical metrology development and application to understanding and modeling thickness variation arising from chemical-mechanical polishing (CMP). These phases include screening experiments including design of test structures and test masks to gather electrical or optical data, techniques for statistical decomposition and analysis of the data, and approaches to calibrating empirical and physical variation models. These models can be integrated with circuit CAD tools to evaluate different process integration or design rule strategies. One focus for the generation of interconnect design rules are guidelines for the use of 'dummy fill' or 'metal fill' to improve the uniformity of underlying metal density and thus improve the uniformity of oxide thickness within the die. Trade-offs that can be evaluated via statistical metrology include the improvements to uniformity possible versus the effect of increased capacitance due to additional metal

Bayesian statistics in radionuclide metrology: measurement of a decaying source

International Nuclear Information System (INIS)

Bochud, F. O.; Bailat, C.J.; Laedermann, J.P.

2007-01-01

The most intuitive way of defining a probability is perhaps through the frequency at which it appears when a large number of trials are realized in identical conditions. The probability derived from the obtained histogram characterizes the so-called frequentist or conventional statistical approach. In this sense, probability is defined as a physical property of the observed system. By contrast, in Bayesian statistics, a probability is not a physical property or a directly observable quantity, but a degree of belief or an element of inference. The goal of this paper is to show how Bayesian statistics can be used in radionuclide metrology and what its advantages and disadvantages are compared with conventional statistics. This is performed through the example of an yttrium-90 source typically encountered in environmental surveillance measurement. Because of the very low activity of this kind of source and the small half-life of the radionuclide, this measurement takes several days, during which the source decays significantly. Several methods are proposed to compute simultaneously the number of unstable nuclei at a given reference time, the decay constant and the background. Asymptotically, all approaches give the same result. However, Bayesian statistics produces coherent estimates and confidence intervals in a much smaller number of measurements. Apart from the conceptual understanding of statistics, the main difficulty that could deter radionuclide metrologists from using Bayesian statistics is the complexity of the computation. (authors)

The cell pattern correction through design-based metrology

Science.gov (United States)

Kim, Yonghyeon; Lee, Kweonjae; Chang, Jinman; Kim, Taeheon; Han, Daehan; Lee, Kyusun; Hong, Aeran; Kang, Jinyoung; Choi, Bumjin; Lee, Joosung; Yeom, Kyehee; Lee, Jooyoung; Hong, Hyeongsun; Lee, Kyupil; Jin, Gyoyoung

2015-03-01

Starting with the sub 2Xnm node, the process window becomes smaller and tighter than before. Pattern related error budget is required for accurate critical-dimension control of Cell layers. Therefore, lithography has been faced with its various difficulties, such as weird distribution, overlay error, patterning difficulty etc. The distribution of cell pattern and overlay management are the most important factors in DRAM field. We had been experiencing that the fatal risk is caused by the patterns located in the tail of the distribution. The overlay also induces the various defect sources and misalignment issues. Even though we knew that these elements are important, we could not classify the defect type of Cell patterns. Because there is no way to gather massive small pattern CD samples in cell unit block and to compare layout with cell patterns by the CD-SEM. The CD- SEM is used in order to gather these data through high resolution, but CD-SEM takes long time to inspect and extract data because it measures the small FOV. (Field Of View) However, the NGR(E-beam tool) provides high speed with large FOV and high resolution. Also, it's possible to measure an accurate overlay between the target layout and cell patterns because they provide DBM. (Design Based Metrology) By using massive measured data, we extract the result that it is persuasive by applying the various analysis techniques, as cell distribution and defects, the pattern overlay error correction etc. We introduce how to correct cell pattern, by using the DBM measurement, and new analysis methods.

Metrology of electrical quantum

International Nuclear Information System (INIS)

Camon, A.

1996-01-01

Since 1989 the electrical metrology laboratory of TPYCEA and the low temperature physics department of ICMA have been collaborating in the development of electrical quantum metrology. ICMA has been mainly dedicated to implement the state of the art quantum standards for which its experience on cryogenics, superconductivity and low noise instrumentation was essential. On the other hand TPYCEA concentrated its efforts on the metrological aspects, in which it has great experience. The complimentary knowledge of both laboratories, as well as the advice obtained from several prestigious metrology institutes was the key to successful completion of the two projects so far developed: i) The Josephson voltage standard (1989-1991) ii) The quantum Hall resistance standard (1991-1996) This report contains a description of both projects. Even though we can consider that the two projects are finished from the instrumental and metrological point of view, there is still a strong cooperation between ICMA and TPYCEA on the improvement of these standards, as well as on their international validation

Toward reliable and repeatable automated STEM-EDS metrology with high throughput

Science.gov (United States)

Zhong, Zhenxin; Donald, Jason; Dutrow, Gavin; Roller, Justin; Ugurlu, Ozan; Verheijen, Martin; Bidiuk, Oleksii

2018-03-01

New materials and designs in complex 3D architectures in logic and memory devices have raised complexity in S/TEM metrology. In this paper, we report about a newly developed, automated, scanning transmission electron microscopy (STEM) based, energy dispersive X-ray spectroscopy (STEM-EDS) metrology method that addresses these challenges. Different methodologies toward repeatable and efficient, automated STEM-EDS metrology with high throughput are presented: we introduce the best known auto-EDS acquisition and quantification methods for robust and reliable metrology and present how electron exposure dose impacts the EDS metrology reproducibility, either due to poor signalto-noise ratio (SNR) at low dose or due to sample modifications at high dose conditions. Finally, we discuss the limitations of the STEM-EDS metrology technique and propose strategies to optimize the process both in terms of throughput and metrology reliability.

Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory

International Nuclear Information System (INIS)

Advanced Light Source; Yashchuk, Valeriy V; Kirschman, Jonathan L.; Domning, Edward E.; McKinney, Wayne R.; Morrison, Gregory Y.; Smith, Brian V.; Yashchuk, Valeriy V.

2008-01-01

The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace Profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performance and characteristics of the upgraded LTP-II at the ALS Optical Metrology Laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms)slope variation

Ambient Optomechanical Alignment and Pupil Metrology for the Flight Instruments Aboard the James Webb Space Telescope

Science.gov (United States)

Coulter, Phillip; Beaton, Alexander; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hayden, Joseph E.; Hummel, Susann; Hylan, Jason E.; Lee, David; Madison, Timothy J.; Maszkiewicz, Michael;

Intranet and Internet metrological workstation with photonic sensors and transmission

Science.gov (United States)

Romaniuk, Ryszard S.; Pozniak, Krzysztof T.; Dybko, Artur

1999-05-01

We describe in this paper a part of a telemetric network which consists of a workstation with photonic measurement and communication interfaces, structural fiber optic cabling (10/100BaseFX and CAN-FL), and photonic sensors with fiber optic interfaces. The station is equipped with direct photonic measurement interface and most common measuring standards converter (RS, GPIB) with fiber optic I/O CAN bus, O/E converters, LAN and modem ports. The station was connected to the Intranet (ipx/spx) and Internet (tcp/ip) with separate IP number and DNS, WINS names. Virtual measuring environment system program was written specially for such an Intranet and Internet station. The measurement system program communicated with the user via a Graphical User's Interface (GUI). The user has direct access to all functions of the measuring station system through appropriate layers of GUI: telemetric, transmission, visualization, processing, information, help and steering of the measuring system. We have carried out series of thorough simulation investigations and tests of the station using WWW subsystem of the Internet. We logged into the system through the LAN and via modem. The Internet metrological station works continuously under the address http://nms.ipe.pw.edu.pl/nms. The station and the system hear the short name NMS (from Network Measuring System).

General problems of metrology and indirect measuring in cardiology: error estimation criteria for indirect measurements of heart cycle phase durations

Directory of Open Access Journals (Sweden)

Konstantine K. Mamberger

2012-11-01

Full Text Available Aims This paper treats general problems of metrology and indirect measurement methods in cardiology. It is aimed at an identification of error estimation criteria for indirect measurements of heart cycle phase durations. Materials and methods A comparative analysis of an ECG of the ascending aorta recorded with the use of the Hemodynamic Analyzer Cardiocode (HDA lead versus conventional V3, V4, V5, V6 lead system ECGs is presented herein. Criteria for heart cycle phase boundaries are identified with graphic mathematical differentiation. Stroke volumes of blood SV calculated on the basis of the HDA phase duration measurements vs. echocardiography data are compared herein. Results The comparative data obtained in the study show an averaged difference at the level of 1%. An innovative noninvasive measuring technology originally developed by a Russian R & D team offers measuring stroke volume of blood SV with a high accuracy. Conclusion In practice, it is necessary to take into account some possible errors in measurements caused by hardware. Special attention should be paid to systematic errors.

A primary mirror metrology system for the GMT

Science.gov (United States)

Rakich, A.

2016-07-01

The Giant Magellan Telescope (GMT)1 is a 25 m "doubly segmented" telescope composed of seven 8.4 m "unit Gregorian telescopes", on a common mount. Each primary and secondary mirror segment will ideally lie on the geometrical surface of the corresponding rotationally symmetrical full aperture optical element. Therefore, each primary and conjugated secondary mirror segment will feed a common instrument interface, their focal planes co-aligned and cophased. First light with a subset of four unit telescopes is currently scheduled for 2022. The project is currently considering an important aspect of the assembly, integration and verification (AIV) phase of the project. This paper will discuss a dedicated system to directly characterize the on-sky performance of the M1 segments, independently of the M2 subsystem. A Primary Mirror Metrology System (PMS) is proposed. The main purpose of this system will be to he4lp determine the rotation axis of an instrument rotator (the Gregorian Instrument Rotator or GIR in this case) and then to characterize the deflections and deformations of the M1 segments with respect to this axis as a function of gravity and temperature. The metrology system will incorporate a small (180 mm diameter largest element) prime focus corrector (PFC) that simultaneously feeds a risk reduction during AIV; it allows an on-sky characterization of the primary mirror segments and cells, without the complications of other optical elements. The PMS enables a very useful alignment strategy that constrains each primary mirror segments' optical axes to follow the GIR axis to within a few arc seconds. An additional attractive feature of the incorporation of the PMS into the AIV plan, is that it allows first on-sky telescope operations to occur with a system of considerably less optical and control complexity than the final doubly segmented Gregorian telescope configuration. This paper first discusses the strategic rationale for a PMS. Next the system itself is

Research on volume metrology method of large vertical energy storage tank based on internal electro-optical distance-ranging method

Science.gov (United States)

Hao, Huadong; Shi, Haolei; Yi, Pengju; Liu, Ying; Li, Cunjun; Li, Shuguang

2018-01-01

A Volume Metrology method based on Internal Electro-optical Distance-ranging method is established for large vertical energy storage tank. After analyzing the vertical tank volume calculation mathematical model, the key processing algorithms, such as gross error elimination, filtering, streamline, and radius calculation are studied for the point cloud data. The corresponding volume values are automatically calculated in the different liquids by calculating the cross-sectional area along the horizontal direction and integrating from vertical direction. To design the comparison system, a vertical tank which the nominal capacity is 20,000 m3 is selected as the research object, and there are shown that the method has good repeatability and reproducibility. Through using the conventional capacity measurement method as reference, the relative deviation of calculated volume is less than 0.1%, meeting the measurement requirements. And the feasibility and effectiveness are demonstrated.

Metrology for fire experiments in outdoor conditions

CERN Document Server

Silvani, Xavier

2013-01-01

Natural fires can be considered as scale-dependant, non-linear processes of mass, momentum and heat transport, resulting from a turbulent reactive and radiative fluid medium flowing over a complex medium, the vegetal fuel. In natural outdoor conditions, the experimental study of natural fires at real scale needs the development of an original metrology, one able to capture the large range of time and length scales involved in its dynamic nature and also able to resist the thermal, mechanical and chemical aggression of flames on devices. Robust, accurate and poorly intrusive tools must be carefully set-up and used for gaining very fluctuating data over long periods. These signals also need the development of original post-processing tools that take into account the non-steady nature of their stochastic components. Metrology for Fire Experiments in Outdoor Conditions closely analyzes these features, and also describes measurements techniques, the thermal insulation of fragile electronic systems, data acquisitio...

Application of virtual distances methodology to laser tracker verification with an indexed metrology platform

International Nuclear Information System (INIS)

Acero, R; Pueo, M; Santolaria, J; Aguilar, J J; Brau, A

2015-01-01

High-range measuring equipment like laser trackers need large dimension calibrated reference artifacts in their calibration and verification procedures. In this paper, a new verification procedure for portable coordinate measuring instruments based on the generation and evaluation of virtual distances with an indexed metrology platform is developed. This methodology enables the definition of an unlimited number of reference distances without materializing them in a physical gauge to be used as a reference. The generation of the virtual points and reference lengths derived is linked to the concept of the indexed metrology platform and the knowledge of the relative position and orientation of its upper and lower platforms with high accuracy. It is the measuring instrument together with the indexed metrology platform one that remains still, rotating the virtual mesh around them. As a first step, the virtual distances technique is applied to a laser tracker in this work. The experimental verification procedure of the laser tracker with virtual distances is simulated and further compared with the conventional verification procedure of the laser tracker with the indexed metrology platform. The results obtained in terms of volumetric performance of the laser tracker proved the suitability of the virtual distances methodology in calibration and verification procedures for portable coordinate measuring instruments, broadening and expanding the possibilities for the definition of reference distances in these procedures. (paper)

Application of virtual distances methodology to laser tracker verification with an indexed metrology platform

Science.gov (United States)

Acero, R.; Santolaria, J.; Pueo, M.; Aguilar, J. J.; Brau, A.

2015-11-01

High-range measuring equipment like laser trackers need large dimension calibrated reference artifacts in their calibration and verification procedures. In this paper, a new verification procedure for portable coordinate measuring instruments based on the generation and evaluation of virtual distances with an indexed metrology platform is developed. This methodology enables the definition of an unlimited number of reference distances without materializing them in a physical gauge to be used as a reference. The generation of the virtual points and reference lengths derived is linked to the concept of the indexed metrology platform and the knowledge of the relative position and orientation of its upper and lower platforms with high accuracy. It is the measuring instrument together with the indexed metrology platform one that remains still, rotating the virtual mesh around them. As a first step, the virtual distances technique is applied to a laser tracker in this work. The experimental verification procedure of the laser tracker with virtual distances is simulated and further compared with the conventional verification procedure of the laser tracker with the indexed metrology platform. The results obtained in terms of volumetric performance of the laser tracker proved the suitability of the virtual distances methodology in calibration and verification procedures for portable coordinate measuring instruments, broadening and expanding the possibilities for the definition of reference distances in these procedures.

Fundamental performance determining factors of the ultrahigh-precision space-borne optical metrology system for the LISA Pathfinder mission

Science.gov (United States)

Hechenblaikner, Gerald; Flatscher, Reinhold

2013-05-01

The LISA Pathfinder mission to space employs an optical metrology system (OMS) at its core to measure the distance and attitude between two freely floating test-masses to picometer and nanorad accuracy, respectively, within the measurement band of [1 mHz, 30 mHz]. The OMS is based upon an ultra-stable optical bench with 4 heterodyne interferometers from which interference signals are read-out and processed by a digital phase-meter. Laser frequency noise, power fluctuations and optical path-length variations are suppressed to uncritical levels by dedicated control loops so that the measurement performance approaches the sensor limit imposed by the phasemeter. The system design is such that low frequency common mode noise which affects the read-out phase of all four interferometers is generally well suppressed by subtraction of a reference phase from the other interferometer signals. However, high frequency noise directly affects measurement performance and its common mode rejection depends strongly on the relative signal phases. We discuss how the data from recent test campaigns point towards high frequency phase noise as a likely performance limiting factor which explains some important performance features.

Looking at the future of manufacturing metrology: roadmap document of the German VDI/VDE Society for Measurement and Automatic Control

OpenAIRE

Berthold, J.; Imkamp, D.

2013-01-01

"Faster, safer, more accurately and more flexibly'' is the title of the "manufacturing metrology roadmap'' issued by the VDI/VDE Society for Measurement and Automatic Control (http://www.vdi.de/gma). The document presents a view of the development of metrology for industrial production over the next ten years and was drawn up by a German group of experts from research and industry. The following paper summarizes the content of the roadmap and explains the individual concepts of "Faster, safer...

Metrological Array of Cyber-Physical Systems. Part 10. Foundations of Objective Qualimetry

Directory of Open Access Journals (Sweden)

Svyatoslav YATSYSHYN

2015-07-01

Full Text Available Contemporary trend of Cyber-Physical Systems evolution considers as promising line the metrology science development ability for estimation the quality of final or intermediate product. The reliability and perfection of smart and flexible operation of mentioned systems could be permanently improved if determination of critical characteristics would be performed correctly, and particular coordinated assessment would be non-correlatively fulfilled. Last is guaranteed at applying thermodynamic principles of coordinates’ choice.

Ensuring Food Integrity by Metrology and FAIR Data Principles

Directory of Open Access Journals (Sweden)

Michael Rychlik

2018-05-01

Full Text Available Food integrity is a general term for sound, nutritive, healthy, tasty, safe, authentic, traceable, as well as ethically, safely, environment-friendly, and sustainably produced foods. In order to verify these properties, analytical methods with a higher degree of accuracy, sensitivity, standardization and harmonization and a harmonized system for their application in analytical laboratories are required. In this view, metrology offers the opportunity to achieve these goals. In this perspective article the current global challenges in food analysis and the principles of metrology to fill these gaps are presented. Therefore, the pan-European project METROFOOD-RI within the framework of the European Strategy Forum on Research Infrastructures (ESFRI was developed to establish a strategy to allow reliable and comparable analytical measurements in foods along the whole process line starting from primary producers until consumers and to make all data findable, accessible, interoperable, and re-usable according to the FAIR data principles. The initiative currently consists of 48 partners from 18 European Countries and concluded its “Early Phase” as research infrastructure by organizing its future structure and presenting a proof of concept by preparing, distributing and comprehensively analyzing three candidate Reference Materials (rice grain, rice flour, and oyster tissue and establishing a system how to compile, process, and store the generated data and how to exchange, compare them and make them accessible in data bases.

Coordinate Metrology by Traceable Computed Tomography

DEFF Research Database (Denmark)

Müller, Pavel

is an important factor for decision making about manufactured parts. However, due to many influences in CT, estimation of the uncertainty is a challenge, also because standardized procedures and guidelines are not available yet. In this thesis, several methods for uncertainty estimation were applied in connection......, characterization and correction of measurement errors in the CT volume. Their application appeared to be suitable for this task. Because the two objects consist of ruby spheres and carbon fibre, CT scans did not produce image artifacts, and evaluation of sphere-to-sphere distances was robust. Several methods...... metrology and coordinate metrology and is currently becoming more and more important measuring technique for dimensional measurements. This is mainly due to the fact that with CT, a complete three-dimensional model of the scanned part is in a relatively short time visualized using a computer...

Objectives and functions of ionizing radiation metrology

International Nuclear Information System (INIS)

Rothe, H.

1981-01-01

Proceeding from the fundamental objectives of ionizing radiation metrology, the main tasks of metrological research and assurances of accurate measurements in dosimetry and activity determination are summarized. With a view to the technical performance of these tasks the state-of-the-art and the trends in reproduction and dissemination of dosimetric and activity units are outlined. Problems are derived that should be solved within the framework of the CMEA Standing Commissions on Standardization and on the Peaceful Uses of Atomic Energy. (author)

Metrology-based control and profitability in the semiconductor industry

Science.gov (United States)

Weber, Charles

2001-06-01

This paper summarizes three studies of the semiconductor industry conducted at SEMATECH and MIT's Sloan School of Management. In conjunction they lead to the conclusion that rapid problem solving is an essential component of profitability in the semiconductor industry, and that metrology-based control is instrumental to rapid problem solving. The studies also identify the need for defect attribution. Once a source of a defect has been identified, the appropriate resources--human and technological--need to be brought into the physically optimal location for corrective action. The Internet is likely to enable effective defect attribution by inducing collaboration between different companies.

Metrology for Fuel Cell Manufacturing

Energy Technology Data Exchange (ETDEWEB)

Stocker, Michael [National Inst. of Standards and Technology, Gaithersburg, MD (United States); Stanfield, Eric [National Inst. of Standards and Technology, Gaithersburg, MD (United States)

2015-02-04

The project was divided into three subprojects. The first subproject is Fuel Cell Manufacturing Variability and Its Impact on Performance. The objective was to determine if flow field channel dimensional variability has an impact on fuel cell performance. The second subproject is Non-contact Sensor Evaluation for Bipolar Plate Manufacturing Process Control and Smart Assembly of Fuel Cell Stacks. The objective was to enable cost reduction in the manufacture of fuel cell plates by providing a rapid non-contact measurement system for in-line process control. The third subproject is Optical Scatterfield Metrology for Online Catalyst Coating Inspection of PEM Soft Goods. The objective was to evaluate the suitability of Optical Scatterfield Microscopy as a viable measurement tool for in situ process control of catalyst coatings.

Metrological certification of systems to monitor the seal integrity of fuel-element cladding based on exposed fuel in sodium-cooled fast reactors

International Nuclear Information System (INIS)

Eliseev, A.V.; Filonov, V.S.; Ushakov, V.M.; Belov, S.P.; Pedyash, B.V.; Zemtsev, B.V.; Skorikov, N.V.

1992-01-01

In sodium-cooled fast reactors, the clad monitoring system for seal integrity of the fuel element cladding is practically the only source of operator information on the serviceability of fuel elements in the core. The monitoring system can be used as the basis for critical decisions whether the reactor must be shut down of whether operation can continue, but only if the meterologically provided measurements are reliable. This article describes a method developed for certifying working rods on the basis of the domestic standard. The method includes a combined irradiation of the sample and the rod to be certified in an arbitrary field of a plutonium-beryllium neutron source with an output rate greater than 10 8 sec -1 , which is mounted in a paraffin moderator. The positive results of the metrological certification of the system to monitor cladding seal integrity leads the authors to recommend this method for other current and planned sodium-cooled fast reactors. 6 refs., 2 tabs

Metrological inspection of ionization chamber radioactivity meters used in nuclear medicine

International Nuclear Information System (INIS)

Szoerenyi, A.; Vagvoelgyi, J.

1983-01-01

According to the Hungarian legislation on legal metrology, any measurement involving legal effects (e.g. measurements in nuclear medicine) can only be performed by calibrated measuring instruments. The paper outlines the method and results of calibration for 125 I and 131 I radionuclide standard references used in Hungarian nuclear medical practice. The experiences proved that the radionuclide standards, similarly to radiation dosemeters, should be submitted for metrological inspection. (author)

Metrological system for y-ray spectrometry measurement of the specific activity and mass fraction of natural radioactive elements in soil and rock samples

International Nuclear Information System (INIS)

Khaikovich, I.M.; Fominykh, V.I.; Kirisyuk, E.M.; Belyachkov, Y.A.

1994-01-01

In the last few years a great deal of attention has been devoted to the study of the radiation conditions, which in some regions change markedly as a result of intense human activity. One reason for radioactive contamination of an area is dissemination during extraction and processing of radioactive ores or other minerals of natural radioactive elements with a high content of potassium, uranium (radium), and thorium. Estimation of the level of radioactive contamination is one of the main problems of ecological monitoring, and the quality of the measurements sometimes plays a deciding role in the fate of the object being investigated. This also pertains to, in particular, estimation of radioactive contamination of minerals employed for building homes and factories and other industrial structures. In order to draw unequivocal and well-founded conclusions from measurements of the content of natural radioactive elements in soil and rock samples, collected at the object being investigated, a great deal of attention must be devoted during the organization of the measurements to the metrological system

A Secure System Architecture for Measuring Instruments in Legal Metrology

Directory of Open Access Journals (Sweden)

Daniel Peters

2015-03-01

Full Text Available Embedded systems show the tendency of becoming more and more connected. This fact combined with the trend towards the Internet of Things, from which measuring instruments are not immune (e.g., smart meters, lets one assume that security in measuring instruments will inevitably play an important role soon. Additionally, measuring instruments have adopted general-purpose operating systems to offer the user a broader functionality that is not necessarily restricted towards measurement alone. In this paper, a flexible software system architecture is presented that addresses these challenges within the framework of essential requirements laid down in the Measuring Instruments Directive of the European Union. This system architecture tries to eliminate the risks general-purpose operating systems have by wrapping them, together with dedicated applications, in secure sandboxes, while supervising the communication between the essential parts and the outside world.

Metrology and analytical chemistry: Bridging the cultural gap

International Nuclear Information System (INIS)

King, Bernard

2002-01-01

Metrology in general and issues such as traceability and measurement uncertainty in particular are new to most analytical chemists and many remain to be convinced of their value. There is a danger of the cultural gap between metrologists and analytical chemists widening with unhelpful consequences and it is important that greater collaboration and cross-fertilisation is encouraged. This paper discusses some of the similarities and differences in the approaches adopted by metrologists and analytical chemists and indicates how these approaches can be combined to establish a unique metrology of chemical measurement which could be accepted by both cultures. (author)

Metrology of ionizing radiations and environmental measurements

International Nuclear Information System (INIS)

Nourreddine, Abdel-Mjid

2008-01-01

The subject of radiation protection covers all measurements taken by the authorities to ensure protection of the population and its environment against the harmful effects of ionizing radiation. Dosimetry occupies an important place in this field, because it makes it possible to consider and to quantify the risk of using radiations in accordance with the prescribed limits. In this course, we will review the fundamental concepts used in the metrology and dosimetry of ionizing radiations. After classification of ionizing radiations according to their interactions with biological matter, we will present the various quantities and units brought into play and in particular the new operational quantities that are good estimators raising protection standards. They are directly connected to the annual limits of effective dose and of equivalent dose defined in the French regulation relating to the protection of the population and of workers against ionizing radiations. The average natural exposure of the population in France varies between 2 to 2.5 mSv per year, depending on geographic location. It comes principally from three sources: cosmic radiation, radioactive elements contained in the ground and radioactive elements that we absorb when breathing or eating. Radon, which is a naturally occurring radioactive gas, is a public health risk and represents 30% of the exposure. Finally, we will give some applications of dosimetry and environmental measurements developed recently at RaMsEs/IPHC laboratory of Strasbourg. (author)

Looking at the future of manufacturing metrology: roadmap document of the German VDI/VDE Society for Measurement and Automatic Control

Directory of Open Access Journals (Sweden)

J. Berthold

2013-02-01

Full Text Available "Faster, safer, more accurately and more flexibly'' is the title of the "manufacturing metrology roadmap'' issued by the VDI/VDE Society for Measurement and Automatic Control (http://www.vdi.de/gma. The document presents a view of the development of metrology for industrial production over the next ten years and was drawn up by a German group of experts from research and industry. The following paper summarizes the content of the roadmap and explains the individual concepts of "Faster, safer, more accurately and more flexibly'' with the aid of examples.

metrological performance improvement of a superconducting cable test station

CERN Document Server

Montenero, Giuseppe; Ballarino, Amalia

The work presented in this PhD thesis concerns the metrological performance improvement of a superconducting cable test station based on superconducting transformers. The main cable’s parameter to be assessed –as a function of temperature and magnetic field– is the critical current, i.e. beyond this limit the phase transition to the normal state occurs. Ramping the current at levels in the order of the tens of kA can be achieved with superconducting transformers at moderate capital and operational cost. But, issues such as (i) accurate/precise measurements and (ii) monitoring of the secondary current during the device operation have to be addressed. In this regard, the goals of the thesis are the design, prototyping, and validation of a new cryogenic current transducer and effective monitoring system for test stations transformer-based. Among the available transducers for current sensing at room temperature, the DC current transformer (DCCT) provides measurement accuracy in the order of the hundreds of ...

Means to verify the accuracy of CT systems for metrology applications (In the Absence of Established International Standards)

International Nuclear Information System (INIS)

Lettenbauer, H.; Georgi, B.; Weib, D.

2007-01-01

X-ray computed tomography (CT) reconstructs an unknown object from X-ray projections and has long been used for qualitative investigation of internal structures in industrial applications. Recently there has been increased interest in applying X-ray cone beam CT to the task of high-precision dimensional measurements of machined parts, since it is a relatively fast method of measuring both inner and outer geometries of arbitrary complexity. The important information for the user in dimensional metrology is if measured elements of a machined part are within the defined tolerances or not. In order to qualify cone beam CT as an established measurement technology, it must be qualified in the same manner as established measurement technologies such as coordinate measurement machines (CMMs) with tactile or optical sensors. In international standards artefacts are defined that are calibrated by certified institutions. These artefacts are defined by certain geometrical elements. CT measurements are performed on the reconstructed object volume, either directly or using an intermediate surface-extraction step. The results of these measurements have to be compared to the values of the calibrated elements; the level of agreement of the results defines the accuracy of the measurements. By using established methods to define measurement uncertainty a very high level of acceptance in dimensional metrology can be reached for the user. Only if results are comparable to standards of the established technologies the barriers of entry into metrology will be removed and all benefits of this technology will be available for the user. (authors)

Quality assurance of the measurements of the activity conducted by the Brazilian Lab of Ionizing Radiation Metrology of the Instituto de Radioprotecao e Dosimetria, Rio de Janeiro, RJ, Brazil

International Nuclear Information System (INIS)

Silva, Carlos J. da; Delgado, Jose U.; Iwahara, Akira; Bernardes, Estela Maria O.; Prinzio, Maria Antonieta R. de; Oliveira, Antonio Eduardo de; Poledna, Roberto; Lopes, Ricardo Tadeu

2005-01-01

Measuring systems with reentrant type ionization chamber, has been used as reference systems for storing results of international intercomparisons, these systems offer great stability over several years and absolute methods comparable to those uncertainties. This work are presented the calibration factors of a well-type ionization chamber and their uncertainties, the standardization of various radionuclides which present metrological traceability ensured by key comparisons organized by the International Bureau of Weights and Measures

Advantages of High Tolerance Measurements in Fusion Environments Applying Photogrammetry

International Nuclear Information System (INIS)

Dodson, T.; Ellis, R.; Priniski, C.; Raftopoulos, S.; Stevens, D.; Viola, M.

2009-01-01

Photogrammetry, a state-of-the-art technique of metrology employing digital photographs as the vehicle for measurement, has been investigated in the fusion environment. Benefits of this high tolerance methodology include relatively easy deployment for multiple point measurements and deformation/distortion studies. Depending on the equipment used, photogrammetric systems can reach tolerances of 25 microns (0.001 in) to 100 microns (0.004 in) on a 3-meter object. During the fabrication and assembly of the National Compact Stellarator Experiment (NCSX) the primary measurement systems deployed were CAD coordinate-based computer metrology equipment and supporting algorithms such as both interferometer-aided (IFM) and absolute distance measurement based (ADM) laser trackers, as well as portable Coordinate Measurement Machine (CMM) arms. Photogrammetry was employed at NCSX as a quick and easy tool to monitor coil distortions incurred during welding operations of the machine assembly process and as a way to reduce assembly downtime for metrology processes

Information system planning work on maintenance metrological equipment

Directory of Open Access Journals (Sweden)

Dmitry V. Shtoller

2011-05-01

Full Text Available Computerization has entered into all human activities. Important role in the work now is a workstation, which increases productivity. Did not remain without attention and work of the metrological services of enterprises. Electronic records can help solve many problems for the organization of data.

Optics for Processes, Products and Metrology

Science.gov (United States)

Mather, George

1999-04-01

Optical physics has a variety of applications in industry, including process inspection, coatings development, vision instrumentation, spectroscopy, and many others. Optics has been used extensively in the design of solar energy collection systems and coatings, for example. Also, with the availability of good CCD cameras and fast computers, it has become possible to develop real-time inspection and metrology devices that can accommodate the high throughputs encountered in modern production processes. More recently, developments in moiré interferometry show great promise for applications in the basic metals and electronics industries. The talk will illustrate applications of optics by discussing process inspection techniques for defect detection, part dimensioning, birefringence measurement, and the analysis of optical coatings in the automotive, glass, and optical disc industries. In particular, examples of optical techniques for the quality control of CD-R, MO, and CD-RW discs will be presented. In addition, the application of optical concepts to solar energy collector design and to metrology by moiré techniques will be discussed. Finally, some of the modern techniques and instruments used for qualitative and quantitative material analysis will be presented.

Comparison of ATLAS tilecal module No. 8 high-precision metrology measurement results obtained by laser (JINR) and photogrammetric (CERN) methods

International Nuclear Information System (INIS)

Batusov, V.; Budagov, Yu.; Gayde, J.C.

2002-01-01

The high-precision assembly of large experimental set-ups is of a principal necessity for the successful execution of the forthcoming LHC research programme in the TeV-beams. The creation of an adequate survey and control metrology method is an essential part of the detector construction scenario. This work contains the dimension measurement data for ATLAS hadron calorimeter MODULE No. 8 (6 m, 22 tons) which were obtained by laser and by photogrammetry methods. The comparative data analysis demonstrates the measurements agreement within ± 70 μm. It means, these two clearly independent methods can be combined and lead to the rise of a new-generation engineering culture: high-precision metrology when precision assembling of large scale massive objects

Comparison of ATLAS Tilecal MODULE No 8 high-precision metrology measurement results obtained by laser (JINR) and photogrammetric (CERN) methods

CERN Document Server

Batusov, V; Gayde, J C; Khubua, J I; Lasseur, C; Lyablin, M V; Miralles-Verge, L; Nessi, Marzio; Rusakovitch, N A; Sissakian, A N; Topilin, N D

2002-01-01

The high-precision assembly of large experimental set-ups is of a principal necessity for the successful execution of the forthcoming LHC research programme in the TeV-beams. The creation of an adequate survey and control metrology method is an essential part of the detector construction scenario. This work contains the dimension measurement data for ATLAS hadron calorimeter MODULE No. 8 (6 m, 22 tons) which were obtained by laser and by photogrammetry methods. The comparative data analysis demonstrates the measurements agreement within +or-70 mu m. It means, these two clearly independent methods can be combined and lead to the rise of a new-generation engineering culture: high-precision metrology when precision assembling of large scale massive objects. (3 refs).

Gloss evaluation from soft and hard metrologies.

Science.gov (United States)

Wang, Zihao; Xu, Lihao; Hu, Yu; Mirjalili, Fereshteh; Luo, Ming Ronnier

2017-09-01

Recent advances in bidirectional reflectance distribution function (BRDF) acquisitions have provided a novel approach for appearance measurement and analysis. In particular, since gloss appearance is dependent on the directional reflective properties of surfaces, it is reasonable to leverage the BRDF for gloss evaluation. In this paper, we investigate gloss appearance from both soft metrology and hard metrology. A psychophysical experiment was conducted for the gloss assessment of 47 neutral-color samples. In the evaluation of gloss perception from gloss meter measurements, we report several ambiguous correspondences in the medium gloss range. In order to analyze and explain this phenomenon, the BRDF was acquired and examined using a commercial BRDF measuring device. With an improved correlation-to-visual perception, we propose a two-dimensional gloss model by combining a parameter, the standard deviation of the specular lobe, from Ward's BRDF model with measured gloss values.

X-diffraction technique applied for nano system metrology

International Nuclear Information System (INIS)

Kuznetsov, Alexei Yu.; Machado, Rogerio; Robertis, Eveline de; Campos, Andrea P.C.; Archanjo, Braulio S.; Gomes, Lincoln S.; Achete, Carlos A.

2009-01-01

The application of nano materials are fast growing in all industrial sectors, with a strong necessity in nano metrology and normalizing in the nano material area. The great potential of the X-ray diffraction technique in this field is illustrated at the example of metals, metal oxides and pharmaceuticals

Magnetic nanoparticles. Metrological aspects

International Nuclear Information System (INIS)

Nikiforov, V N; Nikiforov, A V; Oxengendler, B L; Turaeva, N N; Sredin, V G

2011-01-01

The experiments on influence of the iron oxide cluster size on the specific magnetic moment are performed. Both free and covered clusters are investigated. The experiments are interpreted on the base of core-shell model by analogy to Weizsaecker formula in the nuclear physics. Metrological parameters for the cluster size investigation are obtained.

Metrology in electricity and magnetism: EURAMET activities today and tomorrow

Science.gov (United States)

Piquemal, F.; Jeckelmann, B.; Callegaro, L.; Hällström, J.; Janssen, T. J. B. M.; Melcher, J.; Rietveld, G.; Siegner, U.; Wright, P.; Zeier, M.

2017-10-01

Metrology dedicated to electricity and magnetism has changed considerably in recent years. It encompasses almost all modern scientific, industrial, and societal challenges, e.g. the revision of the International System of Units, the profound transformation of industry, changes in energy use and generation, health, and environment, as well as nanotechnologies (including graphene and 2D materials) and quantum engineering. Over the same period, driven by the globalization of worldwide trade, the Mutual Recognition Arrangement (referred to as the CIPM MRA) was set up. As a result, the regional metrology organizations (RMOs) of national metrology institutes have grown in significance. EURAMET is the European RMO and has been very prominent in developing a strategic research agenda (SRA) and has established a comprehensive research programme. This paper reviews the highlights of EURAMET in electrical metrology within the European Metrology Research Programme and its main contributions to the CIPM MRA. In 2012 EURAMET undertook an extensive roadmapping exercise for proposed activities for the next decade which will also be discussed in this paper. This work has resulted in a new SRA of the second largest European funding programme: European Metrology Programme for Innovation and Research.

A survey on coordinate metrology using dimensional X-ray CT

International Nuclear Information System (INIS)

Matsuzaki, Kazuya

2016-01-01

X-ray computed tomography (X-ray CT) has been occupying indispensable position in geometrical and dimensional measurements in industry, which is capable of measuring both external and internal dimensions of industrial products. Since dimensional X-ray CT has problems about ensuring traceability and estimating uncertainty, requirement of developing measurement standard for dimensional X-ray CT is increasing. Some of national metrology institutes (NMIs) including NMIJ have been working on developing measurement standard. In this report, the background of coordinate metrology using dimensional X-ray CT is reviewed. Then, measurement error sources are discussed. Finally, the plan to develop high accuracy dimensional X-ray CT is presented. (author)

Tests of operating conditions for metrological application of HTS Josephson arrays

International Nuclear Information System (INIS)

Sosso, A; Lacquaniti, V; Andreone, D; Cerri, R; Klushin, A M

2006-01-01

We report on an experimental study of metrological properties of High Temperature Superconductor arrays, made of shunted bicrystal YBCO Josephson junctions, to assess their accuracy. A detailed analysis of measurement errors is presented, mainly based on a direct comparison of an HTS array against a low temperature array. Owing to the high sensitivity of the comparison, we were able to measure the changes in the HTS array voltage on a step at nanovolt level. A precise estimate of the dependence of the HTS array step width on operating conditions was obtained. Differences were observed with respect to the results provided by the usual, low sensitivity, techniques, confirming that the method we adopted is necessary in the study of HTS arrays for metrology. The high sensitivity analysis was applied in the derivation of the temperature dependence of the critical current as well, providing some insights on the behaviour of the HTS array

Study and operating conditions of HTS Josephson arrays for metrological application

International Nuclear Information System (INIS)

Sosso, A.; Lacquaniti, V.; Andreone, D.; Cerri, R.; Klushin, A.M.

2006-01-01

We report an experimental study of metrological properties of high-temperature superconductor arrays, made of shunted bicrystal YBCO Josephson junctions. The work is mainly based on a direct comparison against a low temperature array. Owing to the high sensitivity of the measurements, we observed at nanovolt level the changes in the HTS array voltage on a step. A precise estimate of the dependence of the HTS array step width on operating conditions was obtained. Differences were observed with respect to the results of low sensitivity techniques, confirming that our method is necessary in the study of HTS arrays for metrology. The high sensitivity analysis was also applied in the derivation of the temperature dependence of the critical current, providing insights on the behavior of the HTS array

Advances in speckle metrology and related techniques

CERN Document Server

Kaufmann, Guillermo H

2010-01-01

Speckle metrology includes various optical techniques that are based on the speckle fields generated by reflection from a rough surface or by transmission through a rough diffuser. These techniques have proven to be very useful in testing different materials in a non-destructive way. They have changed dramatically during the last years due to the development of modern optical components, with faster and more powerful digital computers, and novel data processing approaches. This most up-to-date overview of the topic describes new techniques developed in the field of speckle metrology over the l

Metrology in CNEN NN 3.05/13 standard

International Nuclear Information System (INIS)

Mello, Marina Santiago de

2014-01-01

The nuclear medicine exams are widely used tools in health services for a reliable clinical and functional diagnosis of a disease. In Brazil, the National Nuclear Energy Commission, through the norm CNEN-NN 3:05/13, provides for the requirements of safety and radiological protection in nuclear medicine services. The objective of this review article was to emphasize the importance of metrology in compliance with this norm. We observed that metrology plays a vital role as it ensures the quality, accuracy, reproducibility and consistency of the measurements in the field of nuclear medicine. (author)

Implementation of machine learning for high-volume manufacturing metrology challenges (Conference Presentation)

Science.gov (United States)

Timoney, Padraig; Kagalwala, Taher; Reis, Edward; Lazkani, Houssam; Hurley, Jonathan; Liu, Haibo; Kang, Charles; Isbester, Paul; Yellai, Naren; Shifrin, Michael; Etzioni, Yoav

2018-03-01

In recent years, the combination of device scaling, complex 3D device architecture and tightening process tolerances have strained the capabilities of optical metrology tools to meet process needs. Two main categories of approaches have been taken to address the evolving process needs. In the first category, new hardware configurations are developed to provide more spectral sensitivity. Most of this category of work will enable next generation optical metrology tools to try to maintain pace with next generation process needs. In the second category, new innovative algorithms have been pursued to increase the value of the existing measurement signal. These algorithms aim to boost sensitivity to the measurement parameter of interest, while reducing the impact of other factors that contribute to signal variability but are not influenced by the process of interest. This paper will evaluate the suitability of machine learning to address high volume manufacturing metrology requirements in both front end of line (FEOL) and back end of line (BEOL) sectors from advanced technology nodes. In the FEOL sector, initial feasibility has been demonstrated to predict the fin CD values from an inline measurement using machine learning. In this study, OCD spectra were acquired after an etch process that occurs earlier in the process flow than where the inline CD is measured. The fin hard mask etch process is known to impact the downstream inline CD value. Figure 1 shows the correlation of predicted CD vs downstream inline CD measurement obtained after the training of the machine learning algorithm. For BEOL, machine learning is shown to provide an additional source of information in prediction of electrical resistance from structures that are not compatible for direct copper height measurement. Figure 2 compares the trench height correlation to electrical resistance (Rs) and the correlation of predicted Rs to the e-test Rs value for a far back end of line (FBEOL) metallization level

Surface slope metrology of highly curved x-ray optics with an interferometric microscope

Science.gov (United States)

Gevorkyan, Gevork S.; Centers, Gary; Polonska, Kateryna S.; Nikitin, Sergey M.; Lacey, Ian; Yashchuk, Valeriy V.

2017-09-01

The development of deterministic polishing techniques has given rise to vendors that manufacture high quality threedimensional x-ray optics. The surface metrology on these optics remains a difficult task. For the fabrication, vendors usually use unique surface metrology tools, generally developed on site, that are not available in the optical metrology labs at x-ray facilities. At the Advanced Light Source X-Ray Optics Laboratory, we have developed a rather straightforward interferometric-microscopy-based procedure capable of sub microradian characterization of sagittal slope variation of x-ray optics for two-dimensionally focusing and collimating (such as ellipsoids, paraboloids, etc.). In the paper, we provide the mathematical foundation of the procedure and describe the related instrument calibration. We also present analytical expression describing the ideal surface shape in the sagittal direction of a spheroid specified by the conjugate parameters of the optic's beamline application. The expression is useful when analyzing data obtained with such optics. The high efficiency of the developed measurement and data analysis procedures is demonstrated in results of measurements with a number of x-ray optics with sagittal radius of curvature between 56 mm and 480 mm. We also discuss potential areas of further improvement.

Metrological tests of a 200 L calibration source for HPGE detector systems for assay of radioactive waste drums

International Nuclear Information System (INIS)

Boshkova, T.; Mitev, K.

2016-01-01

In this work we present test procedures, approval criteria and results from two metrological inspections of a certified large volume "1"5"2Eu source (drum about 200 L) intended for calibration of HPGe gamma assay systems used for activity measurement of radioactive waste drums. The aim of the inspections was to prove the stability of the calibration source during its working life. The large volume source was designed and produced in 2007. It consists of 448 identical sealed radioactive sources (modules) apportioned in 32 transparent plastic tubes which were placed in a wooden matrix which filled the drum. During the inspections the modules were subjected to tests for verification of their certified characteristics. The results show a perfect compliance with the NIST basic guidelines for the properties of a radioactive certified reference material (CRM) and demonstrate the stability of the large volume CRM-drum after 7 years of operation. - Highlights: • Large (200 L) volume drum source designed, produced and certified as CRM in 2007. • Source contains 448 identical sealed radioactive "1"5"2Eu sources (modules). • Two metrological inspections in 2011 and 2014. • No statistically significant changes of the certified characteristics over time. • Stable calibration source for HPGe-gamma radioactive waste assay systems.

Metrological characterization of 3D imaging devices

Science.gov (United States)

Guidi, G.

2013-04-01

Manufacturers often express the performance of a 3D imaging device in various non-uniform ways for the lack of internationally recognized standard requirements for metrological parameters able to identify the capability of capturing a real scene. For this reason several national and international organizations in the last ten years have been developing protocols for verifying such performance. Ranging from VDI/VDE 2634, published by the Association of German Engineers and oriented to the world of mechanical 3D measurements (triangulation-based devices), to the ASTM technical committee E57, working also on laser systems based on direct range detection (TOF, Phase Shift, FM-CW, flash LADAR), this paper shows the state of the art about the characterization of active range devices, with special emphasis on measurement uncertainty, accuracy and resolution. Most of these protocols are based on special objects whose shape and size are certified with a known level of accuracy. By capturing the 3D shape of such objects with a range device, a comparison between the measured points and the theoretical shape they should represent is possible. The actual deviations can be directly analyzed or some derived parameters can be obtained (e.g. angles between planes, distances between barycenters of spheres rigidly connected, frequency domain parameters, etc.). This paper shows theoretical aspects and experimental results of some novel characterization methods applied to different categories of active 3D imaging devices based on both principles of triangulation and direct range detection.

Bluetooth-based distributed measurement system

International Nuclear Information System (INIS)

Tang Baoping; Chen Zhuo; Wei Yuguo; Qin Xiaofeng

2007-01-01

A novel distributed wireless measurement system, which is consisted of a base station, wireless intelligent sensors and relay nodes etc, is established by combining of Bluetooth-based wireless transmission, virtual instrument, intelligent sensor, and network. The intelligent sensors mounted on the equipments to be measured acquire various parameters and the Bluetooth relay nodes get the acquired data modulated and sent to the base station, where data analysis and processing are done so that the operational condition of the equipment can be evaluated. The establishment of the distributed measurement system is discussed with a measurement flow chart for the distributed measurement system based on Bluetooth technology, and the advantages and disadvantages of the system are analyzed at the end of the paper and the measurement system has successfully been used in Daqing oilfield, China for measurement of parameters, such as temperature, flow rate and oil pressure at an electromotor-pump unit

Bluetooth-based distributed measurement system

Science.gov (United States)

Tang, Baoping; Chen, Zhuo; Wei, Yuguo; Qin, Xiaofeng

2007-07-01

A novel distributed wireless measurement system, which is consisted of a base station, wireless intelligent sensors and relay nodes etc, is established by combining of Bluetooth-based wireless transmission, virtual instrument, intelligent sensor, and network. The intelligent sensors mounted on the equipments to be measured acquire various parameters and the Bluetooth relay nodes get the acquired data modulated and sent to the base station, where data analysis and processing are done so that the operational condition of the equipment can be evaluated. The establishment of the distributed measurement system is discussed with a measurement flow chart for the distributed measurement system based on Bluetooth technology, and the advantages and disadvantages of the system are analyzed at the end of the paper and the measurement system has successfully been used in Daqing oilfield, China for measurement of parameters, such as temperature, flow rate and oil pressure at an electromotor-pump unit.

Bluetooth-based distributed measurement system

Energy Technology Data Exchange (ETDEWEB)

Tang Baoping; Chen Zhuo; Wei Yuguo; Qin Xiaofeng [Department of Mechatronics, College of Mechanical Engineering, Chongqing University, Chongqing, 400030 (China)

2007-07-15

A novel distributed wireless measurement system, which is consisted of a base station, wireless intelligent sensors and relay nodes etc, is established by combining of Bluetooth-based wireless transmission, virtual instrument, intelligent sensor, and network. The intelligent sensors mounted on the equipments to be measured acquire various parameters and the Bluetooth relay nodes get the acquired data modulated and sent to the base station, where data analysis and processing are done so that the operational condition of the equipment can be evaluated. The establishment of the distributed measurement system is discussed with a measurement flow chart for the distributed measurement system based on Bluetooth technology, and the advantages and disadvantages of the system are analyzed at the end of the paper and the measurement system has successfully been used in Daqing oilfield, China for measurement of parameters, such as temperature, flow rate and oil pressure at an electromotor-pump unit.

La Metrología Óptica y sus Aplicaciones La Metrología Óptica y sus Aplicaciones

OpenAIRE

Daniel Malacara Hernández

2012-01-01

En este trabajo se presenta una introducción al campo de la metrología óptica y de su herramienta principal que es la interferometría. También se presenta un panorama de los diferentes métodos empleados en metrología describiendo con especial detalle los avances más recientes en este campo. In this work an introduction to optical metrology is presented with a brief description of its main tool which is interferometry. Also, a survey of the main different methods used in optical metrology is ...

Regional metrology organisations and the JCRB

International Nuclear Information System (INIS)

Hetherington, Paul

2004-01-01

In 1999, National Metrology Institutes (NMIs) from some 39 countries signed the International Committee of Weights and Measures (CIPM) Mutual Recognition Arrangement (MRA) in Paris. The MRA, drawn up by the CIPM, under the authority given to it in the Metre Convention, was in response to requirements of Governments and Regulators to provide a sound technical foundation for trade agreements. Core objectives of the MRA are to allow for the establishment of the degree of equivalence of national measurement standards and to provide for mutual recognition of calibration certificates issued by NMIs. This presentation will detail the evolution of the MRA. Globally, NMIs are affiliated to Regional Metrology Organisations (RMOs). The key role of the RMOs in the MRA process will be discussed along with the structure and objectives of the various RMOs worldwide. The Joint Committee of the RMOs and the BIPM (JCRB) plays a central part in the effective operation of the MRA. Its tasks, membership and output will also be described

Social profit in the context of the activities at Fluids Measurement Sector in Legal Metrology Department - Inmetro

Science.gov (United States)

Cinelli, L. R.; Silva, L. G.; Junior, E. A.; Almeida, R. O.

2018-03-01

This article was prepared in the context of the work of the Fluids Measurement Sector (Seflu) of the Legal Metrology Department of Inmetro (Dimel) in order to try to answer the following question: What is the magnitude of Social Profit generated for brazilian society from the existence of legal control of measuring instruments within the scope of this sector? In this sense, some examples of a case study containing the main measurement instruments related to the evaluation process of models performed at the Seflu are presented.

Image-based overlay and alignment metrology through optically opaque media with sub-surface probe microscopy

Science.gov (United States)

van Es, Maarten H.; Mohtashami, Abbas; Piras, Daniele; Sadeghian, Hamed

2018-03-01

Nondestructive subsurface nanoimaging through optically opaque media is considered to be extremely challenging and is essential for several semiconductor metrology applications including overlay and alignment and buried void and defect characterization. The current key challenge in overlay and alignment is the measurement of targets that are covered by optically opaque layers. Moreover, with the device dimensions moving to the smaller nodes and the issue of the so-called loading effect causing offsets between between targets and product features, it is increasingly desirable to perform alignment and overlay on product features or so-called on-cell overlay, which requires higher lateral resolution than optical methods can provide. Our recently developed technique known as SubSurface Ultrasonic Resonance Force Microscopy (SSURFM) has shown the capability for high-resolution imaging of structures below a surface based on (visco-)elasticity of the constituent materials and as such is a promising technique to perform overlay and alignment with high resolution in upcoming production nodes. In this paper, we describe the developed SSURFM technique and the experimental results on imaging buried features through various layers and the ability to detect objects with resolution below 10 nm. In summary, the experimental results show that the SSURFM is a potential solution for on-cell overlay and alignment as well as detecting buried defects or voids and generally metrology through optically opaque layers.

The Act of 17 March 2000 on metrology and on changes and amendments of some acts

International Nuclear Information System (INIS)

2000-01-01

This act metrology for organization of unity and correctness of mensuration adapts (a) the law measurement units, (b) the requests on committed gauges and their metrological control, (c) the conditions of official mensuration, (d) the requests on consumptive packages articles; (e) the conditions of authorization and registration, (f) operation of organs of the state administration for metrology, (g) the metrological authority (h) putting of fines. This act shall into effect on 1 July 2000

Activities of IPEN Nuclear Metrology Laboratory

International Nuclear Information System (INIS)

Dias, M.S.; Koskinas, M.F.; Pocobi, E.; Silva, C.A.M.; Machado, R.R.

1987-01-01

The activities of IPEN Nuclear Metrology Laboratory, which the principal objective is radionuclides activities determination for supplying sources and standard radioactive solutions in activity are presented. The systems installed, the activity bands and some of standards radionuclides are shown. (C.G.C.) [pt

CDF central detector installation. An efficient merge of digital photogrammetry and laser tracker metrology

International Nuclear Information System (INIS)

Greenwood, John A.; Wojcik, George J.

2003-01-01

Metrology for Run II at the Collider Detector at Fermilab (CDF) required a very complex geodetic survey. The Collision Hall network, surveyed with a Laser Tracker and digital level, provides a constraining network for the positioning of the Central Detector (CD). A part-based Laser Tracker network, which surrounded the 2,000-ton CD, was used as control for assembly. Subassembly surveys of the Detector's major components were measured as independent networks using Laser Tracker, V-STARS/S (Video-Simultaneous Triangulation And Resection System/Single camera) digital photogrammetry system, and BETS (Brunson Electronic Theodolite System) theodolite triangulation system. Each subassembly survey was transformed into and constrained by the part-based network. For roll-in, the CD part-based network was transformed into the Collision Hall network coordinate system. The CD was positioned in the Collision Hall using two Laser Trackers in 'stakeout mode.' This paper discusses the survey, adjustment, transformation, and precision of the various networks. (author)

Dual frequency comb metrology with one fiber laser

Science.gov (United States)

Zhao, Xin; Takeshi, Yasui; Zheng, Zheng

2016-11-01

Optical metrology techniques based on dual optical frequency combs have emerged as a hotly studied area targeting a wide range of applications from optical spectroscopy to microwave and terahertz frequency measurement. Generating two sets of high-quality comb lines with slightly different comb-tooth spacings with high mutual coherence and stability is the key to most of the dual-comb schemes. The complexity and costs of such laser sources and the associated control systems to lock the two frequency combs hinder the wider adoption of such techniques. Here we demonstrate a very simple and rather different approach to tackle such a challenge. By employing novel laser cavity designs in a mode-locked fiber laser, a simple fiber laser setup could emit dual-comb pulse output with high stability and good coherence between the pulse trains. Based on such lasers, comb-tooth-resolved dual-comb optical spectroscopy is demonstrated. Picometer spectral resolving capability could be realized with a fiber-optic setup and a low-cost data acquisition system and standard algorithms. Besides, the frequency of microwave signals over a large range can be determined based on a simple setup. Our results show the capability of such single-fiber-laser-based dual-comb scheme to reduce the complexity and cost of dual-comb systems with excellent quality for different dual-comb applications.

Development of a metrology method for composition and thickness of barium strontium titanate thin films

International Nuclear Information System (INIS)

Remmel, Thomas; Werho, Dennis; Liu, Ran; Chu, Peir

1998-01-01

Thin films of barium strontium titanate (BST) are being investigated as the charge storage dielectric in advanced memory devices, due to their promise for high dielectric constant. Since the capacitance of BST films is a function of both stoichiometry and thickness, implementation into manufacturing requires precise metrology methods to monitor both of these properties. This is no small challenge, considering the BST film thicknesses are 60 nm or less. A metrology method was developed based on X-ray Fluorescence and applied to the measurement of stoichiometry and thickness of BST thin films in a variety of applications

Towards absolute quantification of allergenic proteins in food--lysozyme in wine as a model system for metrologically traceable mass spectrometric methods and certified reference materials.

Science.gov (United States)

Cryar, Adam; Pritchard, Caroline; Burkitt, William; Walker, Michael; O'Connor, Gavin; Burns, Duncan Thorburn; Quaglia, Milena

2013-01-01

Current routine food allergen quantification methods, which are based on immunochemistry, offer high sensitivity but can suffer from issues of specificity and significant variability of results. MS approaches have been developed, but currently lack metrological traceability. A feasibility study on the application of metrologically traceable MS-based reference procedures was undertaken. A proof of concept involving proteolytic digestion and isotope dilution MS for quantification of protein allergens in a food matrix was undertaken using lysozyme in wine as a model system. A concentration of lysozyme in wine of 0.95 +/- 0.03 microg/g was calculated based on the concentrations of two peptides, confirming that this type of analysis is viable at allergenically meaningful concentrations. The challenges associated with this promising method were explored; these included peptide stability, chemical modification, enzymatic digestion, and sample cleanup. The method is suitable for the production of allergen in food certified reference materials, which together with the achieved understanding of the effects of sample preparation and of the matrix on the final results, will assist in addressing the bias of the techniques routinely used and improve measurement confidence. Confirmation of the feasibility of MS methods for absolute quantification of an allergenic protein in a food matrix with results traceable to the International System of Units is a step towards meaningful comparison of results for allergen proteins among laboratories. This approach will also underpin risk assessment and risk management of allergens in the food industry, and regulatory compliance of the use of thresholds or action levels when adopted.

Metrology Sampling Strategies for Process Monitoring Applications

KAUST Repository

Vincent, Tyrone L.; Stirton, James Broc; Poolla, Kameshwar

2011-01-01

, economic pressures prompt a reduction in metrology, for both capital and cycle-time reasons. This paper explores the use of modeling and minimum-variance prediction as a method to select the sites for measurement on each wafer. The models are developed

100 Years of radionuclide metrology

International Nuclear Information System (INIS)

Judge, S.M.; Arnold, D.; Chauvenet, B.; Collé, R.; De Felice, P.; García-Toraño, E.; Wätjen, U.

2014-01-01

The discipline of radionuclide metrology at national standards institutes started in 1913 with the certification by Curie, Rutherford and Meyer of the first primary standards of radium. In early years, radium was a valuable commodity and the aim of the standards was largely to facilitate trade. The focus later changed to providing standards for the new wide range of radionuclides, so that radioactivity could be used for healthcare and industrial applications while minimising the risk to patients, workers and the environment. National measurement institutes responded to the changing demands by developing new techniques for realising primary standards of radioactivity. Looking ahead, there are likely to be demands for standards for new radionuclides used in nuclear medicine, an expansion of the scope of the field into quantitative imaging to facilitate accurate patient dosimetry for nuclear medicine, and an increasing need for accurate standards for radioactive waste management and nuclear forensics. - Highlights: • The driving forces for the development of radionuclide metrology. • Radium standards to facilitate trade of this valuable commodity in the early years. • After 1950, focus changes to healthcare and industrial applications. • National Measurement Institutes develop new techniques, standards, and disseminate the best practice in measurement. • Challenges in nuclear medicine, radioactive waste management and nuclear forensics

Sensors for Metering Heat Flux Area Density and Metrological Equipment for the Heat Flux Density Measurement

Science.gov (United States)

Doronin, D. O.

2018-04-01

The demand in measuring and studies of heat conduction of various media is very urgent now. This article considers the problem of heat conduction monitoring and measurement in various media and materials in any industries and branches of science as well as metrological support of the heat flux measurement equipment. The main study objects are both the sensors manufactured and facilities onto which these sensors will be installed: different cladding structures of the buildings, awnings, rocket fairings, boiler units, internal combustion engines. The Company develops and manufactures different types of heat flux sensors: thermocouple, thin-film, heterogeneous gradient as well as metrological equipment for the gauging calibration of the heat flux density measurement. The calibration shall be performed using both referencing method in the unit and by fixed setting of the heat flux in the unit. To manufacture heterogeneous heat flux gradient sensors (HHFGS) the Company developed and designed a number of units: diffusion welding unit, HHFGS cutting unit. Rather good quality HHFGS prototypes were obtained. At this stage the factory tests on the equipment for the heat flux density measurement equipment are planned. A high-sensitivity heat flux sensor was produced, now it is tested at the Construction Physics Research Institute (Moscow). It became possible to create thin-film heat flux sensors with the sensitivity not worse than that of the sensors manufactured by Captec Company (France). The Company has sufficient premises to supply the market with a wide range of sensors, to master new sensor manufacture technologies which will enable their application range.

Criterion Validation Testing of Clinical Metrology Instruments for Measuring Degenerative Joint Disease Associated Mobility Impairment in Cats.

Science.gov (United States)

Gruen, Margaret E; Griffith, Emily H; Thomson, Andrea E; Simpson, Wendy; Lascelles, B Duncan X

2015-01-01

Degenerative joint disease and associated pain are common in cats, particularly in older cats. There is a need for treatment options, however evaluation of putative therapies is limited by a lack of suitable, validated outcome measures that can be used in the target population of client owned cats. The objectives of this study were to evaluate low-dose daily meloxicam for the treatment of pain associated with degenerative joint disease in cats, and further validate two clinical metrology instruments, the Feline Musculoskeletal Pain Index (FMPI) and the Client Specific Outcome Measures (CSOM). Sixty-six client owned cats with degenerative joint disease and owner-reported impairments in mobility were screened and enrolled into a double-masked, placebo-controlled, randomized clinical trial. Following a run-in baseline period, cats were given either placebo or meloxicam for 21 days, then in a masked washout, cats were all given placebo for 21 days. Subsequently, cats were given the opposite treatment, placebo or meloxicam, for 21 days. Cats wore activity monitors throughout the study, owners completed clinical metrology instruments following each period. Activity counts were increased in cats during treatment with daily meloxicam (pdegenerative joint disease.

EQ-10 electrodeless Z-pinch EUV source for metrology applications

Science.gov (United States)

Gustafson, Deborah; Horne, Stephen F.; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2011-11-01

With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

Metrology network: a case study on the metrology network of defense and security from SIBRATEC

International Nuclear Information System (INIS)

Pereira, Marisa Ferraz Figueira

2016-01-01

This study is focused on understanding the effects of the infrastructure improvement of these laboratories and the role of network management in offering support and metrological services to the defense and security sector enterprises, within the project purposes. It is also aimed identify gaps on offering calibration and, or testing services to supply demands of the defense and security industries, and analyze adequacy of RDS project to demands of defense and security industries, with the purpose to contribute with information for future actions. The experimental research is qualitative type, with exploratory research characteristics, based on case study. It was structured in two parts, involving primary data collection and secondary data. In order to collect the primary data two questionnaires were prepared, one (Questionnaire A) to the five RDS laboratories representatives and other (Questionnaire B) to the contacts of 63 defense and security enterprises which need calibration and test services, possible customers of RDS laboratories. Answers from four representatives of RDS laboratories and from 26 defense and security enterprises were obtained. The collection of secondary data was obtained from documentary research. The analysis was made based on five dimensions defined in order to organize and improve the understanding of the research setting. They are RDS project coverage, regional, network management, metrological traceability and importance and visibility of RDS. The results indicated that the performance of RDS does not interfere, by that time, in the metrological traceability of the products of the defense and security enterprises that participated in the research. (author)

Laser metrology applied to the nuclear maintenance

International Nuclear Information System (INIS)

Garrido Garcia, J.; Sarti Fernandez, F.

2012-01-01

The development of this paper focuses on providing an overview of the state of the art about laser metrology. This type of equipment combines the measurement philosophy of laser scanning with the great precision of the robotic equipment of auscultation. Getting micron.

Data acquisition and processing system for coincidence measurements

International Nuclear Information System (INIS)

Li Xu

1990-07-01

An instrument has been designed for the absolute measurement of radioactivity with 4πβ(PC)-γ coincidence. The instrument can be used as a standard device for the radioactivity measurement in metrology laboratories. Also it can be used in the nuclear science and engineering research for absolute measurement of nuclear decay rate. The control of the system dead time and coincidence resolving time is digitized. The precision can reach ±2 ns. For data acquisition and communication the normalizing GPIB interface system technique is adopted. The measuring error caused by this instrument itself can be better than ±0.02%

Quantum metrology in open systems: dissipative Cramér-Rao bound.

Science.gov (United States)

Alipour, S; Mehboudi, M; Rezakhani, A T

2014-03-28

Estimation of parameters is a pivotal task throughout science and technology. The quantum Cramér-Rao bound provides a fundamental limit of precision allowed to be achieved under quantum theory. For closed quantum systems, it has been shown how the estimation precision depends on the underlying dynamics. Here, we propose a general formulation for metrology scenarios in open quantum systems, aiming to relate the precision more directly to properties of the underlying dynamics. This feature may be employed to enhance an estimation precision, e.g., by quantum control techniques. Specifically, we derive a Cramér-Rao bound for a fairly large class of open system dynamics, which is governed by a (time-dependent) dynamical semigroup map. We illustrate the utility of this scenario through three examples.

A universal measuring and monitoring system for nuclear radiation

International Nuclear Information System (INIS)

Genrich, V.

1988-01-01

Genitron Instruments, Frankfurt/Main, committed themselves to revise the 'conventional' concept of counting tube metrology. The goal was to develop a modular system that would allow large-area measuring tasks. The contribution in hand explains this development, which consists of a highly integrated measuring head that can be combined with various detector types, and complemented by various system components, to form a universal measuring and monitoring system for nuclear radiation. This modular design concept is capable of fulfilling a multitude of tasks, ranging from single, specific applications to non-stop monitoring tasks within a large-area measuring network. (orig./DG) [de

Bell Inequality, Einstein-Podolsky-Rosen Steering, and Quantum Metrology with Spinor Bose-Einstein Condensates

Science.gov (United States)

Wasak, Tomasz; Chwedeńczuk, Jan

2018-04-01

We propose an experiment, where the Bell inequality is violated in a many-body system of massive particles. The source of correlated atoms is a spinor F =1 Bose-Einstein condensate residing in an optical lattice. We characterize the complete procedure—the local operations, the measurements, and the inequality—necessary to run the Bell test. We show how the degree of violation of the Bell inequality depends on the strengths of the two-body correlations and on the number of scattered pairs. We show that the system can be used to demonstrate the Einstein-Podolsky-Rosen paradox. Also, the scattered pairs are an excellent many-body resource for the quantum-enhanced metrology. Our results apply to any multimode system where the spin-changing collision drives the scattering into separate regions. The presented inquiry shows that such a system is versatile as it can be used for the tests of nonlocality, quantum metrology, and quantum information.

Bell Inequality, Einstein-Podolsky-Rosen Steering, and Quantum Metrology with Spinor Bose-Einstein Condensates.

Science.gov (United States)

Wasak, Tomasz; Chwedeńczuk, Jan

2018-04-06

We propose an experiment, where the Bell inequality is violated in a many-body system of massive particles. The source of correlated atoms is a spinor F=1 Bose-Einstein condensate residing in an optical lattice. We characterize the complete procedure-the local operations, the measurements, and the inequality-necessary to run the Bell test. We show how the degree of violation of the Bell inequality depends on the strengths of the two-body correlations and on the number of scattered pairs. We show that the system can be used to demonstrate the Einstein-Podolsky-Rosen paradox. Also, the scattered pairs are an excellent many-body resource for the quantum-enhanced metrology. Our results apply to any multimode system where the spin-changing collision drives the scattering into separate regions. The presented inquiry shows that such a system is versatile as it can be used for the tests of nonlocality, quantum metrology, and quantum information.

Design and implementation of a prototype for metrology with UVED and photodiodes

International Nuclear Information System (INIS)

Hidalgo Padilla, Rodney Ernesto

2013-01-01

A test system was developed for measuring radiant flux produced by a UVED, using photodiodes with the aim of improving metrology systems used in LAFTLA (Laboratorio de Fotonica y Tecnologia Laser, Universidad de Costa Rica). The system has been used to calibrate three teams of measurement. The calibration procedure has been to measure the radiation of UVED using the devices. Each device has repeated the measurement process, with a pattern, comparing the values obtained and taking into account the differences between areas of the sensors. Problems with the maximum capacity of measuring equipment were solved, in some cases this capacity was less than the required. Some sources of error have been identified, for example, the differences between the theoretical and actual values of the specifications. (author) [es

A three-fingered, touch-sensitive, metrological micro-robotic assembly tool

International Nuclear Information System (INIS)

Torralba, Marta; Hastings, D J; Thousand, Jeffery D; Nowakowski, Bartosz K; Smith, Stuart T

2015-01-01

This article describes a metrological, robotic hand to manipulate and measure micrometer size objects. The presented work demonstrates not only assembly operations, but also positioning control and metrology capability. Sample motion is achieved by a commercial positioning stage, which provides XYZ-displacements for assembly of components. A designed and manufactured gripper tool that incorporates 21 degrees-of-freedom for independent alignment of actuators, sensors, and the three fingers of this hand is presented. These fingers can be opened and closed by piezoelectric actuators through levered flexures providing an 80 μm displacement range measured with calibrated opto-interrupter based, knife-edge sensors. The operational ends of the fingers comprise of a quartz tuning fork with a 7 μm diameter 3.2 mm long carbon fiber extending from the end of one tuning fork tine. Finger-tip force-sensing is achieved by the monitoring of individual finger resonances typically at around 32 kHz. Experimental results included are focused on probe performance analysis. Pick and place operation using the three fingers is demonstrated with all fingers being continuously oscillated, a capability not possible with the previous single or two finger tweezer type designs. By monitoring electrical feedback during pick and place operations, changes in the response of the three probes demonstrate the ability to identify both grab and release operations. Component metrology has been assessed by contacting different micro-spheres of diameters 50(±7.5) μm, 135(±20) μm, and 140(±20) μm. These were measured by the micro robot to have diameters of 67, 133, and 126 μm respectively with corresponding deviations of 4.2, 4.9, and 4.3 μm. This deviation in the measured results was primarily due to the manual, joystick-based, contacting of the fingers, difficulties associated with centering the components to the axis of the hand, and lower contact sensitivity for the smallest sphere

Ionising radiation metrology for the metallurgical industry

Directory of Open Access Journals (Sweden)

García-Toraño E.

2014-01-01

Full Text Available Every year millions tons of steel are produced worldwide from recycled scrap loads. Although the detection systems in the steelworks prevent most orphan radioactive sources from entering the furnace, there is still the possibility of accidentally melting a radioactive source. The MetroMetal project, carried out in the frame of the European Metrology Research Programme (EMRP, addresses this problem by studying the existing measurement systems, developing sets of reference sources in various matrices (cast steel, slag, fume dust and proposing new detection instruments. This paper presents the key lines of the project and describes the preparation of radioactive sources as well as the intercomparison exercises used to test the calibration and correction methods proposed within the project.

Frequency Standards and Metrology

Science.gov (United States)

Maleki, Lute

2009-04-01

: its construction and performance (Invited) / T. Li ... [et al.].Compensated multi-pole mercury trapped ion frequency standard and stability evaluation of systematic effects (Invited) / E. A. Burt ... [et al.]. Research of frequency standards in SIOM - atomic frequency standards based on coherent storage (Invited) / B. Yan ... [et al.]. The PTB fountain clock ensemble preliminary characterization of the new fountain CSF2 / N. Nemitz ... [et al.]. The pulsed optically pumped clock: microwave and optical detection / S. Micalizio ... [et al.]. Research on characteristics of pulsed optically pumped rubidium frequency standard / J. Deng ... [et al.]. Status of the continuous cold fountain clocks at METAS-LTF / A. Joyet ... [et al.]. Experiments with a new [symbol]Hg+ ion clock / E. A. Burt ... [et al.]. Optimising a high-stability CW laser-pumped rubidium gas-cell frequency standard / C. Affolderbach ... [et al.]. Raman-Ramsey Cs cell atomic clock / R. Boudot ... [et al.] -- pt. VIII. Microwave resonators & oscillators. Solutions and ultimate limits in temperature compensation of metallic cylindrical microwave resonators (Invited) / A. De Marchi. Cryogenic sapphire oscillators (Invited) / J. G. Hartnett, E. N. Ivanov and M. E. Tobar. Ultra-stable optical cavity: design and experiments / J. Millo ... [et al.]. New results for whispering gallery mode cryogenic sapphire maser oscillators / K. Benmessai ... [et al.] -- pt. IX. Advanced techniques. Fundamental noise-limited optical phase locking at Femtowatt light levels (Invited) / J. Dick ... [et al.]. Microwave and optical frequency transfer via optical fibre / G. Marra ... [et al.]. Ultra-stable laser source for the [symbol]Sr+ single-ion optical frequency standard at NRC / P. Dubé, A. A. Madej and J. E. Bernard. Clock laser system for a strontium lattice clock / T. Legero ... [et al.]. Measurement noise floor for a long-distance optical carrier transmission via fiber / G. Grosche ... [et al.]. Optical frequency transfer

Plant equipment services with laser metrology

International Nuclear Information System (INIS)

Hayes, J.H.; Kreitman, P.J.

1995-01-01

A new industrial metrology process is now being applied to support PWR Nuclear Plant Steam Generator Replacement Projects. The method uses laser tracking interferometry to perform as built surveys of existing and replacement plant equipment. This method provides precision data with a minimum of setup when compared to alternative methods available. In addition there is no post processing required to ascertain validity. The data is obtained quickly, processed in real time and displayed during the survey in the desired coordinate system. These capabilities make this method of industrial measure ideal for various data acquisition needs throughout the power industry, from internal/external equipment templating to area mapping. Laser tracking interferometry is an improvement on the present use of optical instruments and surveying technique. In order to describe the laser tracking interferometry measurement process, previous methods of templating and surveying are first reviewed

Comet: An internet based platform for education in measurement

NARCIS (Netherlands)

Regtien, Paulus P.L.; Halaj, Martin; Kureková, Eva; Gabko, Peter

2005-01-01

The project COMET provides a multimedia training package for metrology and measurement. The package is developed by a consortium of 10 institutes from 7 European countries. It consists of 31 modules, each dealing with a particular aspect of metrology, and is available in English, German, French and

Miniaturized diffraction based interferometric distance measurement sensor

Science.gov (United States)

Kim, Byungki

In this thesis, new metrology hardware is designed, fabricated, and tested to provide improvements over current MEMS metrology. The metrology system is a micromachined scanning interferometer (muSI) having a sub-nm resolution in a compact design. The proposed microinterferometer forms a phase sensitive diffraction grating with interferomeric sensitivity, while adding the capability of better lateral resolution by focusing the laser to a smaller spot size. A detailed diffraction model of the microinterferometer was developed to simulate the device performance and to suggest the location of photo detectors for integrated optoelectronics. A particular device is fabricated on a fused silica substrate using aluminum to form the deformable diffraction grating fingers and AZ P4620 photo resist (PR) for the microlens. The details of the fabrication processes are presented. The structure also enables optoelectronics to be integrated so that the interferometer with photo detectors can fit in an area that is 1 mm x 1 mm. The scanning results using a fixed grating muSI demonstrated that it could measure vibration profile as well as static vertical (less than a half wave length) and lateral dimension of MEMS. The muSI, which is integrated with photo diodes, demonstrated its operation by scanning a cMUT. The PID control has been tested and resulted in improvement in scanned images. The integrated muSI demonstrated that the deformable grating could be used to tune the measurement keep the interferometer in quadrature for highest sensitivity.

Metrology of radiation protection. Pt. 1. Physical requirements and terminology

Energy Technology Data Exchange (ETDEWEB)

Wagner, S R

1979-10-01

Starting from a general consideration of the needs for radiation protection the physical requirements of a relevant metrology are developed. The expedient physical quantities are introduced and problems in the realization and dissemination of their units discussed. It is shown that owing to these difficulties, derived or operational quantities have to be developed for the construction and calibration of practical measuring instruments. Finally the relations between the metrology of radiation protection and of medical radiology are pointed out and commented. (orig.).

Metrological Traceability in the Social Sciences: A Model from Reading Measurement

International Nuclear Information System (INIS)

Stenner, A Jackson; Fisher, William P Jr

2013-01-01

The central importance of reading ability in learning makes it the natural place to start in formative and summative assessments in education. The Lexile Framework for Reading constitutes a commercial metrological traceability network linking books, test results, instructional materials, and students in elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia

Activity measurements of radioactive solutions by liquid scintillation counting and pressurized ionization chambers and Monte Carlo simulations of source-detector systems for metrology

International Nuclear Information System (INIS)

Amiot, Marie-Noelle

2013-01-01

The research works 'Activity measurements of radioactive solutions by liquid scintillation and pressurized ionization chambers and Monte Carlo simulations of source-detector systems' was presented for the graduation: 'Habilitation a diriger des recherches'. The common thread of both themes liquid scintillation counting and pressurized ionization chambers lies in the improvement of the techniques of radionuclide activity measurement. Metrology of ionization radiation intervenes in numerous domains, in the research, in the industry including the environment and the health, which are subjects of constant concern for the world population these last years. In this big variety of applications answers a large number of radionuclides of diverse disintegration scheme and under varied physical forms. The presented works realized within the National Laboratory Henri Becquerel have for objective to assure detector calibration traceability and to improve the methods of activity measurements within the framework of research projects and development. The improvement of the primary and secondary activity measurement methods consists in perfecting the accuracy of the measurements in particular by a better knowledge of the parameters influencing the detector yield. The works of development dealing with liquid scintillation counting concern mainly the study of the response of liquid scintillators to low energy electrons as well as their linear absorption coefficients using synchrotron radiation. The research works on pressurized ionization chambers consist of the study of their response to photons and electrons by experimental measurements compared to the simulation of the source-detector system using Monte Carlo codes. Besides, the design of a new type of ionization chamber with variable pressure is presented. This new project was developed to guarantee the precision of the amount of activity injected into the patient within the framework of diagnosis examination

Impact of shrinking measurement error budgets on qualification metrology sampling and cost

Science.gov (United States)

Sendelbach, Matthew; Sarig, Niv; Wakamoto, Koichi; Kim, Hyang Kyun (Helen); Isbester, Paul; Asano, Masafumi; Matsuki, Kazuto; Vaid, Alok; Osorio, Carmen; Archie, Chas

2014-04-01

When designing an experiment to assess the accuracy of a tool as compared to a reference tool, semiconductor metrologists are often confronted with the situation that they must decide on the sampling strategy before the measurements begin. This decision is usually based largely on the previous experience of the metrologist and the available resources, and not on the statistics that are needed to achieve acceptable confidence limits on the final result. This paper shows a solution to this problem, called inverse TMU analysis, by presenting statistically-based equations that allow the user to estimate the needed sampling after providing appropriate inputs, allowing him to make important "risk vs. reward" sampling, cost, and equipment decisions. Application examples using experimental data from scatterometry and critical dimension scanning electron microscope (CD-SEM) tools are used first to demonstrate how the inverse TMU analysis methodology can be used to make intelligent sampling decisions before the start of the experiment, and then to reveal why low sampling can lead to unstable and misleading results. A model is developed that can help an experimenter minimize the costs associated both with increased sampling and with making wrong decisions caused by insufficient sampling. A second cost model is described that reveals the inadequacy of current TEM (Transmission Electron Microscopy) sampling practices and the enormous costs associated with TEM sampling that is needed to provide reasonable levels of certainty in the result. These high costs reach into the tens of millions of dollars for TEM reference metrology as the measurement error budgets reach angstrom levels. The paper concludes with strategies on how to manage and mitigate these costs.

Laboratorio de Metrología - LABM

OpenAIRE

Jaramillo Ch., Zaira J.

2011-01-01

esos y transacciones de forma transparente y justa para todas las partes involucradas. Una herramienta necesaria para este propósito es la Metrología, ciencia que es utilizada en el Laboratorio de Metrología (LABM) del Centro Experimenta

Fabrication, performance, and figure metrology of epoxy-replicated aluminum foils for hard x-ray focusing multilayer-coated segmented conical optics

DEFF Research Database (Denmark)

Jimenez-Garate, M.A.; Craig, W.W.; Hailey, C.J.

2000-01-01

We fabricated x-ray mirrors for hard x-ray (greater than or equal to 10 keV) telescopes using multilayer coatings and an improved epoxy-replicated aluminum foil (ERAF) nonvacuum technology. The ERAF optics have similar to1 arcmin axial figure half-power diameter (HPD) and passed environmental...... telescope HPD, we designed a figure metrology system and a new mounting technique. We describe a cylindrical metrology system built for fast axial and roundness figure measurement of hard x-ray conical optics. These developments lower cost and improve the optics performance of the HEFT (high-energy focusing...

Procedure and reference standard to determine the structural resolution in coordinate metrology

Science.gov (United States)

Illemann, Jens; Bartscher, Markus; Jusko, Otto; Härtig, Frank; Neuschaefer-Rube, Ulrich; Wendt, Klaus

2014-06-01

A new procedure and reference standards for specifying the structural resolution in coordinate metrology traceable to the SI unit the metre are proposed. With the definition of the structural resolution, a significant gap will be closed to complete ‘acceptance and verification tests’ of the coordinate measuring systems (CMSs) which are specified in the ISO 10360 series dealing with tactile sensors, optical sensors, and x-ray computed tomography measurement systems (CTs). The proposed new procedure uses reference standards with circular rounded edges. The idea is to measure the radius of curvature on a calibrated round edge structure. From the deviation between the measured and the calibrated radius, an analogue Gaussian broadening of the measurement system is determined. This value is a well-defined and easy-to-apply measure to define the structural resolution for dimensional measurements. It is applicable to CMSs which are based on different sensing principles, e.g. tactile, optical and CT systems. On the other hand, it has a physical meaning similar to the classical optical point-spread function. It makes it possible to predict which smallest details the CMS is capable of measuring reliably for an arbitrary object shape. The theoretical background of the new procedure is given, an appropriate reference standard is described and comparative, quantitative measurement data of CMSs featuring different sensors are shown.

The Remarkable Metrological History of Radiocarbon Dating [II].

Science.gov (United States)

Currie, Lloyd A

2004-01-01

This article traces the metrological history of radiocarbon, from the initial breakthrough devised by Libby, to minor (evolutionary) and major (revolutionary) advances that have brought (14)C measurement from a crude, bulk [8 g carbon] dating tool, to a refined probe for dating tiny amounts of precious artifacts, and for "molecular dating" at the 10 µg to 100 µg level. The metrological advances led to opportunities and surprises, such as the non-monotonic dendrochronological calibration curve and the "bomb effect," that gave rise to new multidisciplinary areas of application, ranging from archaeology and anthropology to cosmic ray physics to oceanography to apportionment of anthropogenic pollutants to the reconstruction of environmental history. Beyond the specific topic of natural (14)C, it is hoped that this account may serve as a metaphor for young scientists, illustrating that just when a scientific discipline may appear to be approaching maturity, unanticipated metrological advances in their own chosen fields, and unanticipated anthropogenic or natural chemical events in the environment, can spawn new areas of research having exciting theoretical and practical implications.

Scanner focus metrology and control system for advanced 10nm logic node

Science.gov (United States)

Oh, Junghun; Maeng, Kwang-Seok; Shin, Jae-Hyung; Choi, Won-Woong; Won, Sung-Keun; Grouwstra, Cedric; El Kodadi, Mohamed; Heil, Stephan; van der Meijden, Vidar; Hong, Jong Kyun; Kim, Sang-Jin; Kwon, Oh-Sung

2018-03-01

Immersion lithography is being extended beyond the 10-nm node and the lithography performance requirement needs to be tightened further to ensure good yield. Amongst others, good on-product focus control with accurate and dense metrology measurements is essential to enable this. In this paper, we will present new solutions that enable onproduct focus monitoring and control (mean and uniformity) suitable for high volume manufacturing environment. We will introduce the concept of pure focus and its role in focus control through the imaging optimizer scanner correction interface. The results will show that the focus uniformity can be improved by up to 25%.

Adjustment method for embedded metrology engine in an EM773 series microcontroller.

Science.gov (United States)

Blazinšek, Iztok; Kotnik, Bojan; Chowdhury, Amor; Kačič, Zdravko

2015-09-01

This paper presents the problems of implementation and adjustment (calibration) of a metrology engine embedded in NXP's EM773 series microcontroller. The metrology engine is used in a smart metering application to collect data about energy utilization and is controlled with the use of metrology engine adjustment (calibration) parameters. The aim of this research is to develop a method which would enable the operators to find and verify the optimum parameters which would ensure the best possible accuracy. Properly adjusted (calibrated) metrology engines can then be used as a base for variety of products used in smart and intelligent environments. This paper focuses on the problems encountered in the development, partial automatisation, implementation and verification of this method. Copyright © 2015 ISA. Published by Elsevier Ltd. All rights reserved.

Problems of metrological supply of carbon materials production

International Nuclear Information System (INIS)

Belov, G.V.; Bazilevskij, L.P.; Cherkashina, N.V.

1989-01-01

Carbon materials and products contain internal residual stresses and have an anisotropy of properties therefore special methods of tests are required to control their quality. The main metrological problems during development, production and application of carbon products are: metrological supply of production forms and records during the development of production conditions; metrological supply of quality control of the product; metrological supply of methods for the tests of products and the methods to forecast the characteristics of product quality for the period of quaranteed service life

In-line CD metrology with combined use of scatterometry and CD-SEM

Science.gov (United States)

Asano, Masafumi; Ikeda, Takahiro; Koike, Toru; Abe, Hideaki

2006-03-01

Measurement characteristics in scatterometry and CD-SEM for lot acceptance sampling of inline critical dimension (CD) metrology were investigated by using a statistical approach with Monte Carlo simulation. By operation characteristics curve analysis, producer's risk and consumer's risk arising from sampling were clarified. Single use of scatterometry involves a higher risk, such risk being particularly acute in the case of large intra-chip CD variation because it is unable to sufficiently monitor intra-chip CD variation including local CD error. Substituting scatterometry for conventional SEM metrology is accompanied with risks, resulting in the increase of unnecessary cost. The combined use of scatterometry and SEM metrology in which the sampling plan for SEM is controlled by scatterometry is a promising metrology from the viewpoint of the suppression of risks and cost. This is due to the effect that CD errors existing in the distribution tails are efficiently caught.

Metrology test object for dimensional verification in additive manufacturing of metals for biomedical applications.

Science.gov (United States)

Teeter, Matthew G; Kopacz, Alexander J; Nikolov, Hristo N; Holdsworth, David W

2015-01-01

Additive manufacturing continues to increase in popularity and is being used in applications such as biomaterial ingrowth that requires sub-millimeter dimensional accuracy. The purpose of this study was to design a metrology test object for determining the capabilities of additive manufacturing systems to produce common objects, with a focus on those relevant to medical applications. The test object was designed with a variety of features of varying dimensions, including holes, cylinders, rectangles, gaps, and lattices. The object was built using selective laser melting, and the produced dimensions were compared to the target dimensions. Location of the test objects on the build plate did not affect dimensions. Features with dimensions less than 0.300 mm did not build or were overbuilt to a minimum of 0.300 mm. The mean difference between target and measured dimensions was less than 0.100 mm in all cases. The test object is applicable to multiple systems and materials, tests the effect of location on the build, uses a minimum of material, and can be measured with a variety of efficient metrology tools (including measuring microscopes and micro-CT). Investigators can use this test object to determine the limits of systems and adjust build parameters to achieve maximum accuracy. © IMechE 2014.

222Rn gas metrology in Latvia

International Nuclear Information System (INIS)

Bogucarska, T.; Lapenas, A.

2004-01-01

The measurements of radon gas provides in Latvia according with the State radiation monitoring program. The national standard/reference level for the protection of employees and population from exposure to radon Latvia has been accepted. The facilities for calibration of the radon gas measurement instruments and detectors have been established on basic of the Radiation Metrology and Testing Center which is the local SSDL for Baltic Region. The radon measurement instruments and detectors calibration can be performed at the 170-4000 Bq/m 3 range. (author)

Critical evaluation of the Laboratory of Radionuclide Metrology results of the Institute of Radiation Protection and Dosimetry - IRD in the international key comparisons of activity measurement of radioactive solutions

International Nuclear Information System (INIS)

Iwahara, A.; Tauhata, L.; Silva, C.J. da

2014-01-01

The Radionuclide Metrology Laboratory (LMR) of LNMRI/IRD has been participating since 1984, in international key-comparisons of activity measurement of radioactive sources organized by BIPM and the Regional Metrology Organizations as EURAMET and APMP. The measured quantity is the activity of a radioactive solution, in becquerel (Bq), containing the radionuclide involved and the of measurement methods used are 4αβ-γ coincidence/anticoincidence, coincidence sum-peak and liquid scintillation. In this paper a summary of the methods used and a performance analysis of the results obtained are presented. (author)

Metrology for WEST components design and integration optimization

International Nuclear Information System (INIS)

Brun, C.; Archambeau, G.; Blanc, L.; Bucalossi, J.; Chantant, M.; Gargiulo, L.; Hermenier, A.; Le, R.; Pilia, A.

2015-01-01

Highlights: • Metrology methods. • Interests of metrology campaign to optimize margins by reducing uncertainties. • Assembly problems are solved and validated on a numerical mock up. • Post treatment of full 3DScan of the vacuum vessel. - Abstract: On WEST new components will be implemented in an existing environment, emphasis has to be put on the metrology to optimize the design and the assembly. Hence, at a particular stage of the project, several components have to coexist in the limited vessel. Therefore, all the difficulty consists in validating the mechanical interfaces between existing components and new one; minimize the risk of the assembling and to maximize the plasma volume. The CEA/IRFM takes the opportunity of the ambitious project to sign a partnership with an industrial specialized in multipurpose metrology domains. To optimize the assembly procedure, the IRFM Assembly group works in strong collaboration with its industrial, to define and plan the campaigns of metrology. The paper will illustrate the organization, methods and results of the dedicated metrology campaigns have been defined and carried out in the WEST dis/assembly phase. To conclude, the future needs of metrology at CEA/IRFM will be exposed to define the next steps.

Image-based overlay measurement using subsurface ultrasonic resonance force microscopy

Science.gov (United States)

Tamer, M. S.; van der Lans, M. J.; Sadeghian, H.

2018-03-01

Image Based Overlay (IBO) measurement is one of the most common techniques used in Integrated Circuit (IC) manufacturing to extract the overlay error values. The overlay error is measured using dedicated overlay targets which are optimized to increase the accuracy and the resolution, but these features are much larger than the IC feature size. IBO measurements are realized on the dedicated targets instead of product features, because the current overlay metrology solutions, mainly based on optics, cannot provide sufficient resolution on product features. However, considering the fact that the overlay error tolerance is approaching 2 nm, the overlay error measurement on product features becomes a need for the industry. For sub-nanometer resolution metrology, Scanning Probe Microscopy (SPM) is widely used, though at the cost of very low throughput. The semiconductor industry is interested in non-destructive imaging of buried structures under one or more layers for the application of overlay and wafer alignment, specifically through optically opaque media. Recently an SPM technique has been developed for imaging subsurface features which can be potentially considered as a solution for overlay metrology. In this paper we present the use of Subsurface Ultrasonic Resonance Force Microscopy (SSURFM) used for IBO measurement. We used SSURFM for imaging the most commonly used overlay targets on a silicon substrate and photoresist. As a proof of concept we have imaged surface and subsurface structures simultaneously. The surface and subsurface features of the overlay targets are fabricated with programmed overlay errors of +/-40 nm, +/-20 nm, and 0 nm. The top layer thickness changes between 30 nm and 80 nm. Using SSURFM the surface and subsurface features were successfully imaged and the overlay errors were extracted, via a rudimentary image processing algorithm. The measurement results are in agreement with the nominal values of the programmed overlay errors.

Mycotoxin metrology: Gravimetric production of zearalenone calibration solution

Science.gov (United States)

Rego, E. C. P.; Simon, M. E.; Li, Xiuqin; Li, Xiaomin; Daireaux, A.; Choteau, T.; Westwood, S.; Josephs, R. D.; Wielgosz, R. I.; Cunha, V. S.

2018-03-01

Food safety is a major concern for countries developing metrology and quality assurance systems, including the contamination of food and feed by mycotoxins. To improve the mycotoxin analysis and ensure the metrological traceability, CRM of calibration solution should be used. The production of certified mycotoxin solutions is a major challenge due to the limited amount of standard for conducting a proper purity study and due to the cost of standards. The CBKT project was started at BIPM and Inmetro produced gravimetrically one batch of zearelenone in acetronitrile (14.708 ± 0.016 μg/g, k=2) and conducted homogeneity, stability and value assignment studies.

Metrological Array of Cyber-Physical Systems. Part 7. Additive Error Correction for Measuring Instrument

Directory of Open Access Journals (Sweden)

Yuriy YATSUK

2015-06-01

Full Text Available Since during design it is impossible to use the uncertainty approach because the measurement results are still absent and as noted the error approach that can be successfully applied taking as true the nominal value of instruments transformation function. Limiting possibilities of additive error correction of measuring instruments for Cyber-Physical Systems are studied basing on general and special methods of measurement. Principles of measuring circuit maximal symmetry and its minimal reconfiguration are proposed for measurement or/and calibration. It is theoretically justified for the variety of correction methods that minimum additive error of measuring instruments exists under considering the real equivalent parameters of input electronic switches. Terms of self-calibrating and verification the measuring instruments in place are studied.

In-situ virtual metrology for the silicon-dioxide etch rate by using optical emission spectroscopy data

International Nuclear Information System (INIS)

Kim, Boomsoo; Hong, Sangjeen

2014-01-01

As a useful tool for process control in a high volume semiconductor manufacturing environment, virtual metrology for the etch rate in a plasma etch process is investigated using optical emission spectroscopy (OES) data. Virtual metrology is a surrogate measurement taken from the process instead of from direct measurement, and it can provide in-situ metrology of a wafer's geometry from a predictive model. A statistical regression model that correlates the selected wavelengths of the optical emission spectra to the etch rate is established using the OES data collected over 20 experimental runs. In addition, an argon actinometry study is employed to quantify the OES data, and it provides valuable insight into the analysis of the OES data. The established virtual metrology model is further verified with an additional 20 runs of data. As a result, the virtual metrology model with both process recipe tool data and in-situ data shows higher prediction accuracy by as much as 56% compared with either the process recipe tool data or the in-situ data alone.

NASA Administrative Data Base Management Systems, 1984

Science.gov (United States)

Radosevich, J. D. (Editor)

1984-01-01

Strategies for converting to a data base management system (DBMS) and the implementation of the software packages necessary are discussed. Experiences with DBMS at various NASA centers are related including Langley's ADABAS/NATURAL and the NEMS subsystem of the NASA metrology informaton system. The value of the integrated workstation with a personal computer is explored.

COMET: A multimedia internet based platform for education in measurement

NARCIS (Netherlands)

Grattan, K.T.V.; Regtien, Paulus P.L.; Halaj, M; Kureková, E.; Gabko, P

2006-01-01

The project COMET provides a multimedia training package for metrology and measurement. The package is developed by a consortium of 10 institutes from 7 European countries. It consists of 31 modules, each dealing with a particular aspect of metrology, and is available in English, German, French and

Using Vision Metrology System for Quality Control in Automotive Industries

Science.gov (United States)

Mostofi, N.; Samadzadegan, F.; Roohy, Sh.; Nozari, M.

2012-07-01

The need of more accurate measurements in different stages of industrial applications, such as designing, producing, installation, and etc., is the main reason of encouraging the industry deputy in using of industrial Photogrammetry (Vision Metrology System). With respect to the main advantages of Photogrammetric methods, such as greater economy, high level of automation, capability of noncontact measurement, more flexibility and high accuracy, a good competition occurred between this method and other industrial traditional methods. With respect to the industries that make objects using a main reference model without having any mathematical model of it, main problem of producers is the evaluation of the production line. This problem will be so complicated when both reference and product object just as a physical object is available and comparison of them will be possible with direct measurement. In such case, producers make fixtures fitting reference with limited accuracy. In practical reports sometimes available precision is not better than millimetres. We used a non-metric high resolution digital camera for this investigation and the case study that studied in this paper is a chassis of automobile. In this research, a stable photogrammetric network designed for measuring the industrial object (Both Reference and Product) and then by using the Bundle Adjustment and Self-Calibration methods, differences between the Reference and Product object achieved. These differences will be useful for the producer to improve the production work flow and bringing more accurate products. Results of this research, demonstrate the high potential of proposed method in industrial fields. Presented results prove high efficiency and reliability of this method using RMSE criteria. Achieved RMSE for this case study is smaller than 200 microns that shows the fact of high capability of implemented approach.

USING VISION METROLOGY SYSTEM FOR QUALITY CONTROL IN AUTOMOTIVE INDUSTRIES

Directory of Open Access Journals (Sweden)

N. Mostofi

2012-07-01

Full Text Available The need of more accurate measurements in different stages of industrial applications, such as designing, producing, installation, and etc., is the main reason of encouraging the industry deputy in using of industrial Photogrammetry (Vision Metrology System. With respect to the main advantages of Photogrammetric methods, such as greater economy, high level of automation, capability of noncontact measurement, more flexibility and high accuracy, a good competition occurred between this method and other industrial traditional methods. With respect to the industries that make objects using a main reference model without having any mathematical model of it, main problem of producers is the evaluation of the production line. This problem will be so complicated when both reference and product object just as a physical object is available and comparison of them will be possible with direct measurement. In such case, producers make fixtures fitting reference with limited accuracy. In practical reports sometimes available precision is not better than millimetres. We used a non-metric high resolution digital camera for this investigation and the case study that studied in this paper is a chassis of automobile. In this research, a stable photogrammetric network designed for measuring the industrial object (Both Reference and Product and then by using the Bundle Adjustment and Self-Calibration methods, differences between the Reference and Product object achieved. These differences will be useful for the producer to improve the production work flow and bringing more accurate products. Results of this research, demonstrate the high potential of proposed method in industrial fields. Presented results prove high efficiency and reliability of this method using RMSE criteria. Achieved RMSE for this case study is smaller than 200 microns that shows the fact of high capability of implemented approach.

Towards a Uniform Metrological Assessment of Grating-Based Optical Fiber Sensors: From Refractometers to Biosensors.

Science.gov (United States)

Chiavaioli, Francesco; Gouveia, Carlos A J; Jorge, Pedro A S; Baldini, Francesco

2017-06-21

A metrological assessment of grating-based optical fiber sensors is proposed with the aim of providing an objective evaluation of the performance of this sensor category. Attention was focused on the most common parameters, used to describe the performance of both optical refractometers and biosensors, which encompassed sensitivity, with a distinction between volume or bulk sensitivity and surface sensitivity, resolution, response time, limit of detection, specificity (or selectivity), reusability (or regenerability) and some other parameters of generic interest, such as measurement uncertainty, accuracy, precision, stability, drift, repeatability and reproducibility. Clearly, the concepts discussed here can also be applied to any resonance-based sensor, thus providing the basis for an easier and direct performance comparison of a great number of sensors published in the literature up to now. In addition, common mistakes present in the literature made for the evaluation of sensor performance are highlighted, and lastly a uniform performance assessment is discussed and provided. Finally, some design strategies will be proposed to develop a grating-based optical fiber sensing scheme with improved performance.

Metrological approach to quantitative analysis of clinical samples by LA-ICP-MS: A critical review of recent studies.

Science.gov (United States)

Sajnóg, Adam; Hanć, Anetta; Barałkiewicz, Danuta

2018-05-15

Analysis of clinical specimens by imaging techniques allows to determine the content and distribution of trace elements on the surface of the examined sample. In order to obtain reliable results, the developed procedure should be based not only on the properly prepared sample and performed calibration. It is also necessary to carry out all phases of the procedure in accordance with the principles of chemical metrology whose main pillars are the use of validated analytical methods, establishing the traceability of the measurement results and the estimation of the uncertainty. This review paper discusses aspects related to sampling, preparation and analysis of clinical samples by laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) with emphasis on metrological aspects, i.e. selected validation parameters of the analytical method, the traceability of the measurement result and the uncertainty of the result. This work promotes the introduction of metrology principles for chemical measurement with emphasis to the LA-ICP-MS which is the comparative method that requires studious approach to the development of the analytical procedure in order to acquire reliable quantitative results. Copyright © 2018 Elsevier B.V. All rights reserved.

REFERENCE MATERIALS SYSTEM OF SCIENTIFIC METHODICAL CENTRE OF STATE SERVICE OF REFERENCE MATERIALS FOR COMPOSITION AND PROPERTIES OF SUBSTANCES AND MATERIALS URAL RESEARCH INSTITUTE FOR METROLOGY

Directory of Open Access Journals (Sweden)

E. V. Osinseva

2015-01-01

Full Text Available Since 1960s UNIIM performs research in the field of needs in reference materials of composition and properties of substances and materials (RM as well as develops it. During the research UNIIM has developed 757 types of RMs for metrological measurement assurance of factors of composition and properties of substance and materials for test laboratories of chemical, pharmaceutical, fuel, food industry, agriculture, metallurgy and ecological monitoring laboratories. List ofRMs enlarges thanks to development of UNIIM standards and transmission measurement facility from State standards of units. Taking into account the actual requirements in the field of measurements, the UNIIM's key destination is to assure the accuracy and the metrological traceability of measurements. The present-day system of RMs to be developed in UNIIM includes RMs of composition of inorganic and organic compounds and their solutions, fuels, stable isotopic materials, water, grounds, food products, biomaterials, nanomaterials, metals, alloys and other materials offerrous and non-ferrous industry, RMs of properties (thermodynamic, magnetic, physical-chemical, technical of substances and materials. The present article considers history of RMs list development which were created by UNIIM and the strategy of this direction.

Breakthrough In Current In Plane Metrology For Monitoring Large Scale MRAM Production

DEFF Research Database (Denmark)

Cagliani, Alberto; Østerberg, Frederik Westergaard; Hansen, Ole

2017-01-01

The current-in-plane tunneling technique (CIPT) has been a crucial tool in the development of magnetic tunnel junction stacks suitable for Magnetic Random Access Memories (MRAM) for more than a decade. The MRAM development has now reached the maturity to make the transition from R&D to large...... of the Resistance Area product (RA) and the Tunnel Magnetoresistance (TMR) measurements, compared to state of the art CIPT metrology tools dedicated to R&D. On two test wafers, the repeatability of RA and MR was improved up to 350% and the measurement reproducibility up to 1700%. We believe that CIPT metrology now...

Traceability and uncertainty estimation in coordinate metrology

DEFF Research Database (Denmark)

Hansen, Hans Nørgaard; Savio, Enrico; De Chiffre, Leonardo

2001-01-01

National and international standards have defined performance verification procedures for coordinate measuring machines (CMMs) that typically involve their ability to measure calibrated lengths and to a certain extent form. It is recognised that, without further analysis or testing, these results...... are required. Depending on the requirements for uncertainty level, different approaches may be adopted to achieve traceability. Especially in the case of complex measurement situations and workpieces the procedures are not trivial. This paper discusses the establishment of traceability in coordinate metrology...

Opportunities and Risks in Semiconductor Metrology

Science.gov (United States)

Borden, Peter

2005-09-01

New metrology opportunities are constantly emerging as the semiconductor industry attempts to meet scaling requirements. The paper summarizes some of the key FEOL and BEOL needs. These must be weighed against a number of considerations to ensure that they are good opportunities for the metrology equipment supplier. The paper discusses some of these considerations.

CONFERENCE NOTE: CETO—Centro de Ciências e Tecnologias Opticas, Trends in Optical Fibre Metrology and Standards

Science.gov (United States)

1994-01-01

Summer School, 27 June to 8 July 1994, Viana do Castelo, Hotel do Parque, Portugal Optical fibres, with their extremely low transmission loss, untapped bandwidth and controllable dispersion, dominate a broad range of technologies in which applications must respond to the increasing constraints of today's specifications as well as envisage future requirements. Optical fibres dominate communications systems. In the area of sensors, fibre optics will be fully exploited for their immunity to EMI, their high sensitivity and their large dynamic range. The maturity of single mode optical technology has led to intensive R&D of a range of components based on the advantages of transmission characteristics and signal processing. Specifications and intercompatibility requests for the new generation of both analogue and digital fibre optical components and systems has created a demand for sophisticated measuring techniques based on unique and complex instruments. In recent years there has been a signification evolution in response to the explosion of applications and the tightening of specifications. These developments justify a concerted effort to focus on trends in optical fibre metrology and standards. Objective The objective of this school is to provide a progressive and comprehensive presentation of current issues concerning passive and active optical fibre characterization and measurement techniques. Passive fibre components support a variety of developments in optical fibre systems and will be discussed in terms of relevance and standards. Particular attention will be paid to devices for metrological purposes such as reference fibres and calibration artefacts. The characterization and testing of optical fibre amplifiers, which have great potential in telecommunications, data distribution networks and as a system part in instrumentation, will be covered. Methods of measurement and means of calibration with traceability will be discussed, together with the characterization

7/5nm logic manufacturing capabilities and requirements of metrology

Science.gov (United States)

Bunday, Benjamin; Bello, A. F.; Solecky, Eric; Vaid, Alok

2018-03-01

This paper will provide an update to previous works [2][4][9] to our view of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic technology for foundries. First, we will review of the needs of patterned defect, critical dimensional (CD/3D), overlay and films metrology, and present the extensive list of applications for which metrology solutions are needed. We will then update the industry's progress towards addressing gating technical limits of the most important of these metrology solutions, highlighting key metrology technology gaps requiring industry attention and investment.

Material synthesis and evaluation of metrological characteristics of potassium fluozirconate certified reference material

Directory of Open Access Journals (Sweden)

D. G. Lisienko

2016-01-01

Full Text Available The relevance of the study. For metrological support of control methods for composition ofpotassium fluozirconate, used in the production of metallic zirconium, applied in various technical fields, including nuclear power, electronics, chemical engineering. The purpose: development of synthesis technology, and determination of metrological characteristics of certified reference material for composition ofpotassium fluozirconate (set, intended for metrological support of measuring element mass fraction: hafnium (Hf, silicon (Si, iron (Fe, aluminium (Al, chromium (Cr, tin (Sn, titanium (Ti in potassium fluozirconate. Research methods: X-ray diffraction, differential scanning colorimetry, thermogravimetric analysis, atomic-emission spectral analysis with arc excitation, mass spectral analysis, X-ray fluorescence analysis. Results. As a result of research a set of certified reference materials for composition of potassium fluozirconate is developed and produced. The CRM type is approved by Federal Agency on Technical Regulating and Metrology and registered in State Register of Approved Reference Material Types under number GSO 10593-2015.

Investigation into the use of smartphone as a machine vision device for engineering metrology and flaw detection, with focus on drilling

Science.gov (United States)

Razdan, Vikram; Bateman, Richard

2015-05-01

This study investigates the use of a Smartphone and its camera vision capabilities in Engineering metrology and flaw detection, with a view to develop a low cost alternative to Machine vision systems which are out of range for small scale manufacturers. A Smartphone has to provide a similar level of accuracy as Machine Vision devices like Smart cameras. The objective set out was to develop an App on an Android Smartphone, incorporating advanced Computer vision algorithms written in java code. The App could then be used for recording measurements of Twist Drill bits and hole geometry, and analysing the results for accuracy. A detailed literature review was carried out for in-depth study of Machine vision systems and their capabilities, including a comparison between the HTC One X Android Smartphone and the Teledyne Dalsa BOA Smart camera. A review of the existing metrology Apps in the market was also undertaken. In addition, the drilling operation was evaluated to establish key measurement parameters of a twist Drill bit, especially flank wear and diameter. The methodology covers software development of the Android App, including the use of image processing algorithms like Gaussian Blur, Sobel and Canny available from OpenCV software library, as well as designing and developing the experimental set-up for carrying out the measurements. The results obtained from the experimental set-up were analysed for geometry of Twist Drill bits and holes, including diametrical measurements and flaw detection. The results show that Smartphones like the HTC One X have the processing power and the camera capability to carry out metrological tasks, although dimensional accuracy achievable from the Smartphone App is below the level provided by Machine vision devices like Smart cameras. A Smartphone with mechanical attachments, capable of image processing and having a reasonable level of accuracy in dimensional measurement, has the potential to become a handy low-cost Machine vision

Profile variation impact on FIB cross-section metrology

Science.gov (United States)

Cordes, Aaron; Bunday, Benjamin; Nadeau, Jim

2012-03-01

The focused ion beam (FIB) milling tool is an important component of reference metrology and process characterization, both as a supporting instrument for bulk sample preparation before forwarding to the transmission electron microscope (TEM) and other instruments and as an in situ measurement instrument using angled scanning electron microscopy. As features grow denser, deeper and more demanding, full-profile reference metrology is needed, and this methodology will only grow in importance. Thus, the ability to extract accurate dimensional and profile information out of the crosssectional faces produced by FIB milling is critical. For features that demonstrate perfect symmetry in the plane of the cross section, analyzing images and extracting metrology data are straightforward. However, for industrial materials, symmetry is not a safe assumption: as features shrink, the line edge and sidewall roughness increases as a percentage of the overall feature dimension. Furthermore, with the introduction of more complex architectures such as 3D memory and FinFETs, the areas of greatest interest, such as the intersections of wrap-around gates, cannot be assumed to be symmetrical in any given plane if cut placement is not precisely controlled. Therefore it is important to establish the exact location and repeatability of the cross-section plane, both in terms of coordinate placement and effective angle of the milled surface. To this end, we prepared designed-in line edge roughness samples in the Albany Nanotech facility using SEMATECH's AMAG6 metrology reticle. The samples were thoroughly characterized before being milled by a non-destructive, sidewall-scanning atomic force microscope (AFM). These samples are then milled and measured under varying process and setup parameters using a single-beam FIB with angled SEM. We established methodologies that allow precise alignment of the cut planes of slice-and-view FIB milling to 3D-AFM scan lines to compare repeated sections

National Defense Center of Excellence for Industrial Metrology and 3D Imaging

Science.gov (United States)

2012-10-18

Appendices) W911NF-08-2-0057 - Metrology - FinalReport 100 m to 200 m. For volume determination (e.g., mining , excavations) and topographic mapping...infrastructure, rail systems, mining ), mobile mapping, and security applications. Lockheed Martin has selected the HDL-64E as the main perception...Appendices) W911NF-08-2-0057 - Metrology - FinalReport The Obscurant Penetrating Autosynchronous Lidar ( OPAL ) has been developed as a variant ofNeptec ’s

National Needs for Appearance Metrology

Science.gov (United States)

Nadal, Maria E.

2003-04-01

Appearance greatly influences a customer's judgement of the quality and acceptability of manufactured products, as yearly there is approximately $700 billion worth of shipped goods for which overall appearance is critical to their sale. For example, appearance is reported to be a major factor in about half of automobile purchases. The appearance of an object is the result of a complex interaction of the light field incident upon the object, the scattering and absorption properties of the object, and human perception. The measurable attributes of appearance are divided into color (hue, saturation, and lightness) and geometry (gloss, haze). The nature of the global economy has increased international competition and the need to improve the quality of many manufactured products. Since the manufacturing and marketing of these products is international in scope, the lack of national appearance standard artifacts and measurement protocols results in a direct loss to the supplier. One of the primary missions of the National Institute of Standards and Technology (NIST) is to strengthen the U.S. economy by working with industry to develop and apply technology, measurements and standards. The NIST Physics Laboratory has established an appearance metrology laboratory. This new laboratory provides calibration services for 0^o/45^o color standards and 20^o°, 60^o°, and 85^o° specular gloss, and research in the colorimetric characterization of gonioapparent including a new Standard Reference Material for metallic coatings (SRM 2017) and measurement protocols for pearlescent coatings. These services are NIST's first appearance metrology efforts in many years; a response to needs articulated by industry. These services are designed to meet demands for improved measurements and standards to enhance the acceptability of final products since appearance often plays a major role in their acceptability.

An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

Energy Technology Data Exchange (ETDEWEB)

Settens, Charles M. [State Univ. of New York (SUNY), Albany, NY (United States)

2015-01-01

Simultaneous migration of planar transistors to FinFET architectures, the introduction of a plurality of materials to ensure suitable electrical characteristics, and the establishment of reliable multiple patterning lithography schemes to pattern sub-10 nm feature sizes imposes formidable challenges to current in-line dimensional metrologies. Because the shape of a FinFET channel cross-section immediately influences the electrical characteristics, the evaluation of 3D device structures requires measurement of parameters beyond traditional critical dimension (CD), including their sidewall angles, top corner rounding and footing, roughness, recesses and undercuts at single nanometer dimensions; thus, metrologies require sub-nm and approaching atomic level measurement uncertainty. Synchrotron critical dimension small angle X-ray scattering (CD-SAXS) has unique capabilities to non-destructively monitor the cross-section shape of surface structures with single nanometer uncertainty and can perform overlay metrology to sub-nm uncertainty. In this dissertation, we perform a systematic experimental investigation using CD-SAXS metrology on a hierarchy of semiconductor 3D device architectures including, high-aspect-ratio contact holes, H2 annealed Si fins, and a series of grating type samples at multiple points along a FinFET fabrication process increasing in structural intricacy and ending with fully fabricated FinFET. Comparative studies between CD-SAXS metrology and other relevant semiconductor dimensional metrologies, particularly CDSEM, CD-AFM and TEM are used to determine physical limits of CD-SAXS approach for advanced semiconductor samples. CD-SAXS experimental tradeoffs, advice for model-dependent analysis and thoughts on the compatibility with a semiconductor manufacturing environment are discussed.

Applications of surface metrology in firearm identification

International Nuclear Information System (INIS)

Zheng, X; Soons, J; Vorburger, T V; Song, J; Renegar, T; Thompson, R

2014-01-01

Surface metrology is commonly used to characterize functional engineering surfaces. The technologies developed offer opportunities to improve forensic toolmark identification. Toolmarks are created when a hard surface, the tool, comes into contact with a softer surface and causes plastic deformation. Toolmarks are commonly found on fired bullets and cartridge cases. Trained firearms examiners use these toolmarks to link an evidence bullet or cartridge case to a specific firearm, which can lead to a criminal conviction. Currently, identification is typically based on qualitative visual comparison by a trained examiner using a comparison microscope. In 2009, a report by the National Academies called this method into question. Amongst other issues, they questioned the objectivity of visual toolmark identification by firearms examiners. The National Academies recommended the development of objective toolmark identification criteria and confidence limits. The National Institute of Standards and Technology (NIST) have applied its experience in surface metrology to develop objective identification criteria, measurement methods, and reference artefacts for toolmark identification. NIST developed the Standard Reference Material SRM 2460 standard bullet and SRM 2461 standard cartridge case to facilitate quality control and traceability of identifications performed in crime laboratories. Objectivity is improved through measurement of surface topography and application of unambiguous surface similarity metrics, such as the maximum value (ACCF MAX ) of the areal cross correlation function. Case studies were performed on consecutively manufactured tools, such as gun barrels and breech faces, to demonstrate that, even in this worst case scenario, all the tested tools imparted unique surface topographies that were identifiable. These studies provide scientific support for toolmark evidence admissibility in criminal court cases. (paper)

A metrology solution for the orthopaedic industry

International Nuclear Information System (INIS)

Bills, P; Brown, L; Jiang, X; Blunt, L

2005-01-01

Total joint replacement is one of the most common elective surgical procedures performed worldwide, with an estimate of 1.5 million operations performed annually. Currently joint replacements are expected to function for 10-15 years, however, with an increase in life expectancy, and a greater call for knee replacement due to increased activity levels, there is a requirement to improve their function to offer longer term improved quality of life for patients. The amount of wear that a joint incurs is seen as a good indicator of performance, with higher wear rates typically leading to reduced function and premature failure. New technologies and materials are pushing traditional wear assessment methods to their limits, and novel metrology solutions are required to assess wear of joints following in vivo and in vitro use. This paper presents one such measurement technique; a scanning co-ordinate metrology machine for geometrical assessment. A case study is presented to show the application of this technology to a real orthopaedic measurement problem: the wear of components in total knee replacement. This technique shows good results and provides a basis for further developing techniques for geometrical wear assessment of total joint replacements

A method for standardizing the metrological unit of α-track

International Nuclear Information System (INIS)

Liang Xingzhong; Li Qingyang; Li Dianshu

1989-01-01

The conversion from the specialized unit of α-track into the legal metrological unit is described. A circulative method for measuring the transform coefficient is discussed. An experiment about the transform coefficient on a uranium deposit has made

Metrology for radioactive waste management. (WP2, WP3)

International Nuclear Information System (INIS)

Suran, J.

2014-01-01

The three-year European research project M etrology for Radioactive Waste Management' was launched in October 2011 under the EMRP (European Metrology Research Programme). It involves 13 European national metrology institutes and a total budget exceeds four million Euros. The project is coordinated by the Czech Metrology Institute and is divided into five working groups. In this presentation the Project is described. (author)

Bayesian estimation methods in metrology

International Nuclear Information System (INIS)

Cox, M.G.; Forbes, A.B.; Harris, P.M.

2004-01-01

In metrology -- the science of measurement -- a measurement result must be accompanied by a statement of its associated uncertainty. The degree of validity of a measurement result is determined by the validity of the uncertainty statement. In recognition of the importance of uncertainty evaluation, the International Standardization Organization in 1995 published the Guide to the Expression of Uncertainty in Measurement and the Guide has been widely adopted. The validity of uncertainty statements is tested in interlaboratory comparisons in which an artefact is measured by a number of laboratories and their measurement results compared. Since the introduction of the Mutual Recognition Arrangement, key comparisons are being undertaken to determine the degree of equivalence of laboratories for particular measurement tasks. In this paper, we discuss the possible development of the Guide to reflect Bayesian approaches and the evaluation of key comparison data using Bayesian estimation methods

Progress in the design and R and D of the ITER In-Vessel Viewing and Metrology System (IVVS)

Energy Technology Data Exchange (ETDEWEB)

Dubus, Gregory, E-mail: gregory.dubus@f4e.europa.eu [Fusion for Energy, c/ Josep Pla, n°2 – Torres Diagonal Litoral – Edificio B3, 08019 Barcelona (Spain); Puiu, Adrian; Bates, Philip; Damiani, Carlo [Fusion for Energy, c/ Josep Pla, n°2 – Torres Diagonal Litoral – Edificio B3, 08019 Barcelona (Spain); Reichle, Roger; Palmer, Jim [ITER Organization, Route de Vinon sur Verdon, 13115 Saint Paul Lez Durance (France)

2014-10-15

The In-Vessel Viewing and Metrology System (IVVS) is a fundamental tool for the ITER machine operations, aiming at performing inspections as well as providing information related to the erosion of in-vessel components, which in turn is related to the amount of mobilised dust present in the Vacuum Vessel. Periodically or on request, the IVVS scanning probes will be deployed into the Vacuum Vessel in order to acquire both visual and metrological data on plasma facing components (blanket, divertor, heating/diagnostic plugs, and test blanket modules). Recent design changes made to the six IVVS port extensions implied the need for a substantial redesign of the IVVS integrated concept – including the scanning probe and its deployment system – in order to bring it to the level of maturity suitable for the Conceptual Design Review. This paper gives an overview of the concept design for IVVS as well as of the various engineering analyses and R and D activities carried out in support to this design: neutronic, seismic and electromagnetic analyses, probe actuation validation under environmental conditions.

A simulation-based study on the influence of beam hardening in X-ray computed tomography for dimensional metrology.

Science.gov (United States)

Lifton, Joseph J; Malcolm, Andrew A; McBride, John W

2015-01-01

X-ray computed tomography (CT) is a radiographic scanning technique for visualising cross-sectional images of an object non-destructively. From these cross-sectional images it is possible to evaluate internal dimensional features of a workpiece which may otherwise be inaccessible to tactile and optical instruments. Beam hardening is a physical process that degrades the quality of CT images and has previously been suggested to influence dimensional measurements. Using a validated simulation tool, the influence of spectrum pre-filtration and beam hardening correction are evaluated for internal and external dimensional measurements. Beam hardening is shown to influence internal and external dimensions in opposition, and to have a greater influence on outer dimensions compared to inner dimensions. The results suggest the combination of spectrum pre-filtration and a local gradient-based surface determination method are able to greatly reduce the influence of beam hardening in X-ray CT for dimensional metrology.

CONFERENCE NOTE: European Optical Society, Topical Meeting Optical Metrology and Nanotechnology, Engelberg, Switzerland, 27 30 March 1994

Science.gov (United States)

1993-01-01

This meeting, organized by the Paul Scherrer Institute's Department of Applied Solid State Physics, will be held from 27 30 March 1994 at the Hotel Regina-Titlis, Engelberg, Switzerland. The aim is to bring together scientists from two important fields of current research and increasing industrial relevance. Optical metrology is a traditional discipline of applied optics which reached the nanometre scale a long time ago. Nanotechnology is setting new limits and represents a major challenge to metrology, as well as offering new opportunities to optics. The meeting is intended to help define a common future for optical metrology and nanotechnology. Topics to be covered include: nanometre position control and measuring techniques ultrahigh precision interferometry scanning probe microscopy (AFM, SNOM, etc.) surface modification by scanning probe methods precision surface fabrication and characterization nanolithography micro-optics, diffractive optics components, including systems and applications subwavelength optical structures synthetic optical materials structures and technologies for X-ray optics. For further information please contact: Jens Gobrecht (Secretary), Paul Scherrer Institute, CH-5232 Villigen-PSI, Switzerland.Tel. (41)56992529; Fax (41) 5698 2635.

Structural observation of long-span suspension bridges for safety assessment: implementation of an optical displacement measurement system

International Nuclear Information System (INIS)

Martins, L Lages; Ribeiro, A Silva; Rebordão, J M

2015-01-01

This paper addresses the implementation of an optical displacement measurement system in the observation scenario of a long-span suspension bridge and its contribution for structural safety assessment. The metrological background required for quality assurance of the measurements is described, namely, the system's intrinsic parameterization and integration in the SI dimensional traceability chain by calibration, including its measurement uncertainty assessment

Achieving the Heisenberg limit in quantum metrology using quantum error correction.

Science.gov (United States)

Zhou, Sisi; Zhang, Mengzhen; Preskill, John; Jiang, Liang

2018-01-08

Quantum metrology has many important applications in science and technology, ranging from frequency spectroscopy to gravitational wave detection. Quantum mechanics imposes a fundamental limit on measurement precision, called the Heisenberg limit, which can be achieved for noiseless quantum systems, but is not achievable in general for systems subject to noise. Here we study how measurement precision can be enhanced through quantum error correction, a general method for protecting a quantum system from the damaging effects of noise. We find a necessary and sufficient condition for achieving the Heisenberg limit using quantum probes subject to Markovian noise, assuming that noiseless ancilla systems are available, and that fast, accurate quantum processing can be performed. When the sufficient condition is satisfied, a quantum error-correcting code can be constructed that suppresses the noise without obscuring the signal; the optimal code, achieving the best possible precision, can be found by solving a semidefinite program.

Metrology for environment and climate; Metrologie fuer Umwelt und Klima

Energy Technology Data Exchange (ETDEWEB)

Sommer, Klaus-Dieter [Physikalisch-Technische Bundesanstalt (PTB), Braunschweig (Germany). Abt. ' Chemische Physik und Explosionsschutz' ; Spitzer, Petra [Physikalisch-Technische Bundesanstalt (PTB), Braunschweig (Germany). Arbeitsgruppe ' Elektrochemie'

2012-12-15

The author describes the observation and monitoring systems developed by the EU and the Federal Republic of Germany. In this connection the metrological aims are described in connection with the activities of the PTB. (HSI)

Joint Research on Scatterometry and AFM Wafer Metrology

NARCIS (Netherlands)

Bodermann, B.; Buhr, E.; Danzebrink, H.U.; Bär, M.; Scholze, F.; Krumrey, M.; Wurm, M.; Klapetek, P.; Hansen, P.E.; Korpelainen, V.; Van Veghel, M.; Yacoot, A.; Siitonen, S.; El Gawhary, O.; Burger, S.; Saastamoinen, T.

2011-01-01

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both

La metrología en nuestras vidas

OpenAIRE

Jaramillo, Zaira

2010-01-01

A primera vista, la palabra "Metrología" nos trae a la mente la idea de condiciones meteorológicas. Nada más alejado de la realidad, porque la Meteorología es la disciplina que se encarga de estudiar las condiciones del tiempo y la Metrología se encarga de estudiar las mediciones.

Dimensional metrology for process and part quality control in micro manufacturing

DEFF Research Database (Denmark)

Hansen, Hans Nørgaard; Tosello, Guido; Gasparin, Stefania

2011-01-01

dimensions are scaled down and geometrical complexity of objects is increased, the available measurement technologies appear not sufficient. New solutions for measuring principles and instrumentation, tolerancing rules and procedures as well as traceability and calibration are necessary if micro......Micro manufacturing has gained interest over the last decade as the demand for micro mechanical components has increased. The need for dimensional metrology at micro scale is evident both in terms of quality assurance of components and products and in terms of process control. As critical...... manufacturing is to develop into industrial manufacturing solutions. In this paper the application of dimensional precision metrology to both component and process quality control will be demonstrated. The parts investigated are micro injection moulded polymer parts, typical for the field of micro manufacturing....

Methodology for implementation of a national metrology net of radionuclides used in nuclear medicine

International Nuclear Information System (INIS)

Santos, Joyra Amaral dos

2004-01-01

The National Laboratory for Ionizing Radiation Metrology, of the Institute of Radiation Protection and Dosimetry, of the National Commission on Nuclear Energy (IRD/CNEN), comes leading a comparison program for activity measurements of radiopharmaceuticals administered to patients in the Nuclear Medicine Services (NMS) with the purpose to promote the quality control. This work presents a quality assurance program for the performance of such measurements, evaluated in the comparison runs between hospitals and LNMRI, under the statistic point of view and the compliment of regulatory authority norms. The performance of the radionuclides 67 Ga, 123 I, 131 I, 99m Tc and 210 Tl were evaluated and 201 TI have been standardized by absolute methods. Besides, it was established the traceability of the radioactivity standards used in nuclear medicine and a methodology for implementation of a national metrology net of radionuclides. The comparison results prove that the implementation of a radionuclide metrology net is viable, important and feasible. (author)

At-wavelength metrology using the moiré fringe analysis method based on a two dimensional grating interferometer

International Nuclear Information System (INIS)

Wang, Hongchang; Berujon, Sebastien; Pape, Ian; Rutishauser, Simon; David, Christian; Sawhney, Kawal

2013-01-01

A two-dimensional (2D) grating interferometer was used to perform at-wavelength metrology. A Fast Fourier Transform (FFT) of the interferograms recovers the differential X-ray beam phase in two orthogonal directions simultaneously. As an example, the X-ray wavefronts downstream from a Fresnel Zone plate were measured using the moiré fringe analysis method, which requires only a single image. The rotating shearing interferometer technique for moiré fringe analysis was extended from one dimension to two dimensions to carry out absolute wavefront metrology. In addition, the 2D moiré fringes were extrapolated using Gerchberg's method to reduce the boundary artifacts. The advantages and limitations of the phase-stepping method and the moiré fringe analysis method are also discussed. -- Highlights: ► A rapid and sensitive strip test for CPPU (forchlorfenuron) detection is reported. ► Carbon nanoparticles were used for antibody labelling. ► A common flatbed scanner was employed to the quantitate strip spots. ► The new method was successfully applied to the analysis of the field samples

Metrological issues in molecular radiotherapy

International Nuclear Information System (INIS)

D'Arienzo, Marco; Capogni, Marco; Smyth, Vere; Cox, Maurice; Johansson, Lena; Bobin, Christophe

2014-01-01

The therapeutic effect from molecular radiation therapy (MRT), on both tumour and normal tissue, is determined by the radiation absorbed dose. Recent research indicates that as a consequence of biological variation across patients the absorbed dose can vary, for the same administered activity, by as much as two orders of magnitude. The international collaborative EURAMET-EMRP project Metrology for molecular radiotherapy (MetroMRT) is addressing this problem. The overall aim of the project is to develop methods of calibrating and verifying clinical dosimetry in MRT. In the present paper an overview of the metrological issues in molecular radiotherapy is provided. (authors)

Real-time microscopic 3D shape measurement based on optimized pulse-width-modulation binary fringe projection

Science.gov (United States)

Hu, Yan; Chen, Qian; Feng, Shijie; Tao, Tianyang; Li, Hui; Zuo, Chao

2017-07-01

In recent years, tremendous progress has been made in 3D measurement techniques, contributing to the realization of faster and more accurate 3D measurement. As a representative of these techniques, fringe projection profilometry (FPP) has become a commonly used method for real-time 3D measurement, such as real-time quality control and online inspection. To date, most related research has been concerned with macroscopic 3D measurement, but microscopic 3D measurement, especially real-time microscopic 3D measurement, is rarely reported. However, microscopic 3D measurement plays an important role in 3D metrology and is indispensable in some applications in measuring micro scale objects like the accurate metrology of MEMS components of the final devices to ensure their proper performance. In this paper, we proposed a method which effectively combines optimized binary structured patterns with a number-theoretical phase unwrapping algorithm to realize real-time microscopic 3D measurement. A slight defocusing of our optimized binary patterns can considerably alleviate the measurement error based on four-step phase-shifting FPP, providing the binary patterns with a comparable performance to ideal sinusoidal patterns. The static measurement accuracy can reach 8 μm, and the experimental results of a vibrating earphone diaphragm reveal that our system can successfully realize real-time 3D measurement of 120 frames per second (FPS) with a measurement range of 8~\\text{mm}× 6~\\text{mm} in lateral and 8 mm in depth.

Enabling CD SEM metrology for 5nm technology node and beyond

Science.gov (United States)

Lorusso, Gian Francesco; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Bömmels, Jürgen; Wilson, Christopher J.; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnémont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru

2017-03-01

FETs,, metrology for vertical and horizontal NWs. With respect to memory, we discuss a STT-RAM statistical CD analysis and its comparison to electrical performance, ReRAM metrology for VMCO (Vacancy-modulated conductive oxide) with comparison with electrical performance, 3D NAND ONO (Oxide Nitride Oxide) thickness measurements. In addition, we report on 3D morphological reconstruction using CD SEM in conjunction with FIB (Focused Ion Beam), on optimized BKM (Best Known Methods) development methodologies, and on CD SEM overlay. The large variety of results reported here gives a clear overview of the creative effort put in place to ensure that the critical potential of CD SEM metrology tools is fully enabled for the 5nm node and beyond.

Surface Slope Metrology on Deformable Soft X-ray Mirrors

International Nuclear Information System (INIS)

Yuan, Sheng; Yashchuk, Valeriy V.; Goldberg, Kenneth A.; Celestre, Rich; Church, Matthew; McKinney, Wayne R.; Morrison, Greg; Warwick, Tony

2010-01-01

We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situ visible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

Surface Slope Metrology on Deformable Soft X-ray Mirrors

International Nuclear Information System (INIS)

Yuan, S.; Yashchuk, V.V.; Goldberg, K.A.; Celestre, R.; Church, M.; McKinney, W.R.; Morrison, G.; Warwick, T.

2009-01-01

We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situvisible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

Metrology as part and parcel of training programmes for science and engineering

NARCIS (Netherlands)

Regtien, Paulus P.L.

2007-01-01

At many universities and training institutes education in metrology or measurement science is in strong competition with upcoming disciplines. Its importance for science and engineering remains, however, evident. Advanced instruments make measuring almost a routine activity, but it is shown that a

Metrology Department - DEMET

International Nuclear Information System (INIS)

1989-01-01

In this report are presented the activities and purposes of the Metrology Dept. of the Institute of Radioprotection and Dosimetry of Brazilian CNEN. It is also presented a list of services rendered by that Dept., the projects in course, personnel and publications.(J.A.M.M.)

Quality Management of Measurements incl. Documentation

DEFF Research Database (Denmark)

Tosello, Guido; De Chiffre, Leonardo

2004-01-01

-Nürnberg, Chair for Quality Management and Manufacturing-Oriented Metrology (Germany). 'Metro-E-Learn' project proposes to develop and implement a coherent learning and competence chain that leads from introductory and foundation e-courses in initial manufacturing engineering studies towards higher....... Machine tool testing 9. The role of manufacturing metrology for QM 10. Inspection planning 11. Quality management of measurements incl. Documentation 12. Advanced manufacturing measurement technology The present report (which represents the section 11 - Quality management of measurements incl....... Documentation – of the e-learning system) is part of the contribution of the Department for Manufacturing Engineering and Management (IPL) / Centre for Geometrical Metrology (CGM) at the Technical University of Denmark to the MINERVA EU project mentioned above....

Metrology for New Generation Nuclear Power Plants - MetroFission

International Nuclear Information System (INIS)

Johansson, Lena; Dinsdale, Alan; Keightley, John; Filtz, Jean-Remy; Hay, Bruno; DeFelice, Pierino; Sadli, Mohamed; Plompen, Arjan; Heyse, Jan; Pomme, Stefaan; Cassette, Philippe

2013-06-01

containment materials have also been reviewed and new data assessed to represent the interaction between them and the Na coolant, in order to permit calculation of phase and chemical equilibria for severe accident scenarios. Reference metrological facilities and methods have been developed or improved for the measurements of normal spectral emissivity and specific heat up to 1500 deg. C, and thermal diffusivity up to 2000 deg. C. The following actions were notably performed: - Development of two complementary facilities based on different metrological approaches by PTB and LNE for the measurement of emissivity of solid materials at high temperature. - Modification of the LNE diffusivimeter with the development and integration of a specific inductive furnace, and the adaptation of the associated IR detection systems. These facilities have now been used for the measurement of thermophysical properties of some materials. Advantage has been taken of National Measurement Institutes experience in neutron fluence measurements to improve high-energy cross-section measurements. A secondary fluence standard has been established and used to determine the cross sections of actual interest improving nuclear data standards in the form of reduced measurement uncertainties. The heavier actinides and their decay products have a role in the future development and adoption of nuclear power plants in whose fuels they will be present in controlled amounts. An objective of the MetroFission project was to measure the alpha particle emission probabilities of 238 U with certified isotopic composition. The nuclear data from alpha spectrometry of 238 U sources has been successful, obtaining data that will be provided to the international community and that further lower the uncertainties of the nuclear data. The quality of the alpha spectrum measurement, in terms of energy resolution and peak tailing of the 238 U alpha spectra, was significantly better than in any previous measurement. Fission

Observations on the Performance of X-Ray Computed Tomography for Dimensional Metrology

Science.gov (United States)

Corcoran, H. C.; Brown, S. B.; Robson, S.; Speller, R. D.; McCarthy, M. B.

2016-06-01

X-ray computed tomography (XCT) is a rising technology within many industries and sectors with a demand for dimensional metrology, defect, void analysis and reverse engineering. There are many variables that can affect the dimensional metrology of objects imaged using XCT, this paper focusses on the effects of beam hardening due to the orientation of the workpiece, in this case a holeplate, and the volume of material the X-rays travel through. Measurements discussed include unidirectional and bidirectional dimensions, radii of cylinders, fit point deviations of the fitted shapes and cylindricity. Results indicate that accuracy and precision of these dimensional measurements are affected in varying amounts, both by the amount of material the X-rays have travelled through and the orientation of the object.

OBSERVATIONS ON THE PERFORMANCE OF X-RAY COMPUTED TOMOGRAPHY FOR DIMENSIONAL METROLOGY

Directory of Open Access Journals (Sweden)

H. C. Corcoran

2016-06-01

Full Text Available X-ray computed tomography (XCT is a rising technology within many industries and sectors with a demand for dimensional metrology, defect, void analysis and reverse engineering. There are many variables that can affect the dimensional metrology of objects imaged using XCT, this paper focusses on the effects of beam hardening due to the orientation of the workpiece, in this case a holeplate, and the volume of material the X-rays travel through. Measurements discussed include unidirectional and bidirectional dimensions, radii of cylinders, fit point deviations of the fitted shapes and cylindricity. Results indicate that accuracy and precision of these dimensional measurements are affected in varying amounts, both by the amount of material the X-rays have travelled through and the orientation of the object.

Generic distortion model for metrology under optical microscopes

Science.gov (United States)

Liu, Xingjian; Li, Zhongwei; Zhong, Kai; Chao, YuhJin; Miraldo, Pedro; Shi, Yusheng

2018-04-01

For metrology under optical microscopes, lens distortion is the dominant source of error. Previous distortion models and correction methods mostly rely on the assumption that parametric distortion models require a priori knowledge of the microscopes' lens systems. However, because of the numerous optical elements in a microscope, distortions can be hardly represented by a simple parametric model. In this paper, a generic distortion model considering both symmetric and asymmetric distortions is developed. Such a model is obtained by using radial basis functions (RBFs) to interpolate the radius and distortion values of symmetric distortions (image coordinates and distortion rays for asymmetric distortions). An accurate and easy to implement distortion correction method is presented. With the proposed approach, quantitative measurement with better accuracy can be achieved, such as in Digital Image Correlation for deformation measurement when used with an optical microscope. The proposed technique is verified by both synthetic and real data experiments.

National Laboratory of Ionizing Radiation Metrology - Brazilian CNEN

International Nuclear Information System (INIS)

1992-01-01

The activities of the Brazilian National Laboratory of Ionizing Radiations Metrology are described. They include research and development of metrological techniques and procedures, the calibration of area radiation monitors, clinical dosemeters and other instruments and the preparation and standardization of reference radioactive sources. 4 figs., 13 tabs

Six-Port Based Interferometry for Precise Radar and Sensing Applications

Directory of Open Access Journals (Sweden)

Alexander Koelpin

2016-09-01

Full Text Available Microwave technology plays a more important role in modern industrial sensing applications. Pushed by the significant progress in monolithic microwave integrated circuit technology over the past decades, complex sensing systems operating in the microwave and even millimeter-wave range are available for reasonable costs combined with exquisite performance. In the context of industrial sensing, this stimulates new approaches for metrology based on microwave technology. An old measurement principle nearly forgotten over the years has recently gained more and more attention in both academia and industry: the six-port interferometer. This paper reviews the basic concept, investigates promising applications in remote, as well as contact-based sensing and compares the system with state-of-the-art metrology. The significant advantages will be discussed just as the limitations of the six-port architecture. Particular attention will be paid to impairment effects and non-ideal behavior, as well as compensation and linearization concepts. It will be shown that in application fields, like remote distance sensing, precise alignment measurements, as well as interferometrically-evaluated mechanical strain analysis, the six-port architecture delivers extraordinary measurement results combined with high measurement data update rates for reasonable system costs. This makes the six-port architecture a promising candidate for industrial metrology.

X-ray metrology for ULSI structures

International Nuclear Information System (INIS)

Bowen, D. K.; Matney, K. M.; Wormington, M.

1998-01-01

Non-destructive X-ray metrological methods are discussed for application to both process development and process control of ULSI structures. X-ray methods can (a) detect the unacceptable levels of internal defects generated by RTA processes in large wafers, (b) accurately measure the thickness and roughness of layers between 1 and 1000 nm thick and (c) can monitor parameters such as crystallographic texture and the roughness of buried interfaces. In this paper we review transmission X-ray topography, thin film texture measurement, grazing-incidence X-ray reflectivity and high-resolution X-ray diffraction. We discuss in particular their suitability as on-line sensors for process control

Unconditional violation of the shot-noise limit in photonic quantum metrology

Science.gov (United States)

Slussarenko, Sergei; Weston, Morgan M.; Chrzanowski, Helen M.; Shalm, Lynden K.; Verma, Varun B.; Nam, Sae Woo; Pryde, Geoff J.

2017-11-01

Interferometric phase measurement is widely used to precisely determine quantities such as length, speed and material properties1-3. Without quantum correlations, the best phase sensitivity Δ ϕ achievable using n photons is the shot-noise limit, Δ ϕ =1 /√{n }. Quantum-enhanced metrology promises better sensitivity, but, despite theoretical proposals stretching back decades3,4, no measurement using photonic (that is, definite photon number) quantum states has truly surpassed the shot-noise limit. Instead, all such demonstrations, by discounting photon loss, detector inefficiency or other imperfections, have considered only a subset of the photons used. Here, we use an ultrahigh-efficiency photon source and detectors to perform unconditional entanglement-enhanced photonic interferometry. Sampling a birefringent phase shift, we demonstrate precision beyond the shot-noise limit without artificially correcting our results for loss and imperfections. Our results enable quantum-enhanced phase measurements at low photon flux and open the door to the next generation of optical quantum metrology advances.

Fundamental limits of measurement in telecommunications: Experimental and modeling studies in a test optical network on proposal for the reform of telecommunication quantitations

International Nuclear Information System (INIS)

Egan, James; McMillan, Normal; Denieffe, David

2011-01-01

Proposals for a review of the limits of measurement for telecommunications are made. The measures are based on adapting work from the area of chemical metrology for the field of telecommunications. Currie has introduced recommendations for defining the limits of measurement in chemical metrology and has identified three key fundamental limits of measurement. These are the critical level, the detection limit and the determination limit. Measurements on an optical system are used to illustrate the utility of these measures and discussion is given into the advantages of using these fundamental quantitations over existing methods.

Fundamental limits of measurement in telecommunications: Experimental and modeling studies in a test optical network on proposal for the reform of telecommunication quantitations

Energy Technology Data Exchange (ETDEWEB)

Egan, James; McMillan, Normal; Denieffe, David, E-mail: eganj@itcarlow.ie [IT Carlow (Ireland)

2011-08-17

Proposals for a review of the limits of measurement for telecommunications are made. The measures are based on adapting work from the area of chemical metrology for the field of telecommunications. Currie has introduced recommendations for defining the limits of measurement in chemical metrology and has identified three key fundamental limits of measurement. These are the critical level, the detection limit and the determination limit. Measurements on an optical system are used to illustrate the utility of these measures and discussion is given into the advantages of using these fundamental quantitations over existing methods.

Addressing FinFET metrology challenges in 1X node using tilt-beam CD-SEM

Science.gov (United States)

Zhang, Xiaoxiao; Zhou, Hua; Ge, Zhenhua; Vaid, Alok; Konduparthi, Deepasree; Osorio, Carmen; Ventola, Stefano; Meir, Roi; Shoval, Ori; Kris, Roman; Adan, Ofer; Bar-Zvi, Maayan

2014-04-01

At 1X node, 3D FinFETS raise a number of new metrology challenges. Gate height and fin height are two of the most important parameters for process control. At present there is a metrology gap in inline in-die measurement of these parameters. In order to fill this metrology gap, in-column beam tilt has been developed and implemented on Applied Materials V4i+ top-down CD-SEM for height measurement. A low tilt (5°) beam and a high tilt (14°) beam have been calibrated to obtain two sets of images providing measurement of sidewall edge width to calculate height in the host. Evaluations are done with applications in both gate height and fin height. TEM correlation with R2 being 0.89 and precision of 0.81nm have been achieved on various in-die features in gate height application. Fin height measurement shows less accuracy (R2 being 0.77) and precision (1.49 nm) due to challenges brought by fin geometry, yet still promising as first attempt. Sensitivity to DOE offset, die-to-die and in-die variation is demonstrated in both gate height and fin height. Process defect is successfully captured from inline wafers with gate height measurement implemented in production. This is the first successful demonstration of inline in-die gate height measurement for 14nm FinFET process control.

Reference nano-dimensional metrology by scanning transmission electron microscopy

International Nuclear Information System (INIS)

Dai, Gaoliang; Fluegge, Jens; Bosse, Harald; Heidelmann, Markus; Kübel, Christian; Prang, Robby

2013-01-01

Traceable and accurate reference dimensional metrology of nano-structures by scanning transmission electron microscopy (STEM) is introduced in the paper. Two methods, one based on the crystal lattice constant and the other based on the pitch of a feature pair, were applied to calibrate the TEM magnification. The threshold value, which was defined as the half-intensity of boundary materials, is suggested to extract the boundary position of features from the TEM image. Experimental investigations have demonstrated the high potential of the proposed methods. For instance, the standard deviation from ten repeated measurements of a line structure with a nominal 100 nm critical dimension (CD) reaches 1σ = 0.023 nm, about 0.02%. By intentionally introduced defocus and larger sample alignment errors, the investigation shows that these influences may reach 0.20 and 1.3 nm, respectively, indicating the importance of high-quality TEM measurements. Finally, a strategy for disseminating the destructive TEM results is introduced. Using this strategy, the CD of a reference material has been accurately determined. Its agreement over five independent TEM measurements is below 1.2 nm. (paper)

Metrological 2iOF fibre-optic system for position and displacement measurement with 31 pm resolution

Science.gov (United States)

Orłowska, Karolina; Świåtkowski, Michał; Kunicki, Piotr; Gotszalk, Teodor

2018-04-01

In the present paper, we describe a high sensitivity intensity fibre-optic displacement sensor with tens of picometre resolution combined with a sub-picometre resolution interferometric calibration system. Both integrated components form the so-called "2 in one ferrule" system 2iOF. The design and construction of the presented device depend on integrating two sensors' systems within one fibre-optic measuring head, which allows performing in situ calibration process with no additional time-consuming adjustment procedure. The resolution of the 2iOF system is 31 pm/Hz1/2 obtained with an interferometric Fabry-Perot based calibration system—providing accuracy better than tens of fm/Hz1/2 within 1 MHz bandwidth in the measurement range of up to 100 μm. The direct response from the intensity sensor is then the 2iOF output one. It is faster and more convenient to analyze in comparison, with much better resolution (3 orders of magnitude higher) but on the other hand also more time consuming and dependent on the absolute sample position interferometer. The proposed system is flexible and open to various applications. We will present the results of the piezoelectrical actuator displacement measurements, which were performed using the developed system.

Intelligent sampling for the measurement of structured surfaces

International Nuclear Information System (INIS)

Wang, J; Jiang, X; Blunt, L A; Scott, P J; Leach, R K

2012-01-01

Uniform sampling in metrology has known drawbacks such as coherent spectral aliasing and a lack of efficiency in terms of measuring time and data storage. The requirement for intelligent sampling strategies has been outlined over recent years, particularly where the measurement of structured surfaces is concerned. Most of the present research on intelligent sampling has focused on dimensional metrology using coordinate-measuring machines with little reported on the area of surface metrology. In the research reported here, potential intelligent sampling strategies for surface topography measurement of structured surfaces are investigated by using numerical simulation and experimental verification. The methods include the jittered uniform method, low-discrepancy pattern sampling and several adaptive methods which originate from computer graphics, coordinate metrology and previous research by the authors. By combining the use of advanced reconstruction methods and feature-based characterization techniques, the measurement performance of the sampling methods is studied using case studies. The advantages, stability and feasibility of these techniques for practical measurements are discussed. (paper)

Modern gas-based temperature and pressure measurements

CERN Document Server

Pavese, Franco

2013-01-01

This 2nd edition volume of Modern Gas-Based Temperature and Pressure Measurements follows the first publication in 1992. It collects a much larger set of information, reference data, and bibliography in temperature and pressure metrology of gaseous substances, including the physical-chemical issues related to gaseous substances. The book provides solutions to practical applications where gases are used in different thermodynamic conditions. Modern Gas-Based Temperature and Pressure Measurements, 2nd edition is the only comprehensive survey of methods for pressure measurement in gaseous media used in the medium-to-low pressure range closely connected with thermometry. It assembles current information on thermometry and manometry that involve the use of gaseous substances which are likely to be valid methods for the future. As such, it is an important resource for the researcher. This edition is updated through the very latest scientific and technical developments of gas-based temperature and pressure measurem...

Improving the accuracy of CT dimensional metrology by a novel beam hardening correction method

International Nuclear Information System (INIS)

Zhang, Xiang; Li, Lei; Zhang, Feng; Xi, Xiaoqi; Deng, Lin; Yan, Bin

2015-01-01

Its powerful nondestructive characteristics are attracting more and more research into the study of computed tomography (CT) for dimensional metrology, which offers a practical alternative to the common measurement methods. However, the inaccuracy and uncertainty severely limit the further utilization of CT for dimensional metrology due to many factors, among which the beam hardening (BH) effect plays a vital role. This paper mainly focuses on eliminating the influence of the BH effect in the accuracy of CT dimensional metrology. To correct the BH effect, a novel exponential correction model is proposed. The parameters of the model are determined by minimizing the gray entropy of the reconstructed volume. In order to maintain the consistency and contrast of the corrected volume, a punishment term is added to the cost function, enabling more accurate measurement results to be obtained by the simple global threshold method. The proposed method is efficient, and especially suited to the case where there is a large difference in gray value between material and background. Different spheres with known diameters are used to verify the accuracy of dimensional measurement. Both simulation and real experimental results demonstrate the improvement in measurement precision. Moreover, a more complex workpiece is also tested to show that the proposed method is of general feasibility. (paper)

Metrological traceability in education: A practical online system for measuring and managing middle school mathematics instruction

Science.gov (United States)

Torres Irribarra, D.; Freund, R.; Fisher, W.; Wilson, M.

2015-02-01

Computer-based, online assessments modelled, designed, and evaluated for adaptively administered invariant measurement are uniquely suited to defining and maintaining traceability to standardized units in education. An assessment of this kind is embedded in the Assessing Data Modeling and Statistical Reasoning (ADM) middle school mathematics curriculum. Diagnostic information about middle school students' learning of statistics and modeling is provided via computer-based formative assessments for seven constructs that comprise a learning progression for statistics and modeling from late elementary through the middle school grades. The seven constructs are: Data Display, Meta-Representational Competence, Conceptions of Statistics, Chance, Modeling Variability, Theory of Measurement, and Informal Inference. The end product is a web-delivered system built with Ruby on Rails for use by curriculum development teams working with classroom teachers in designing, developing, and delivering formative assessments. The online accessible system allows teachers to accurately diagnose students' unique comprehension and learning needs in a common language of real-time assessment, logging, analysis, feedback, and reporting.

Metrological traceability in education: A practical online system for measuring and managing middle school mathematics instruction

International Nuclear Information System (INIS)

Irribarra, D Torres; Freund, R; Fisher, W; Wilson, M

2015-01-01