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Sample records for homoepitaxial oxide thin

  1. Homoepitaxial Nanostructures of Zinc Oxide

    Directory of Open Access Journals (Sweden)

    Tatiana V. Plakhova

    2015-01-01

    Full Text Available The homoepitaxial ZnO nanostructures (HENS were obtained on different substrates using various techniques. The first type of homoepitaxial ZnO nanorod arrays was grown on Si or ITO substrates by using two alternative sequences: (a seeding → growth from solution → growth from vapor and contrariwise (b seeding → growth from vapor → growth from solution. As follows from transport and cathode luminescence measurements homoepitaxial growth allows enhancing electrical or luminescence properties. The second type of HENS was prepared by growth of vertically or horizontally oriented ZnO nanorod arrays depending on monocrystalline ZnO wafers with [0001] and [10-10] orientation. In all cases the growth occurs along the c-axis of fast growth.

  2. Thin Solid Oxide Cell

    DEFF Research Database (Denmark)

    2010-01-01

    The present invention relates to a thin and in principle unsupported solid oxide cell, comprising at least a porous anode layer, an electrolyte layer and a porous cathode layer, wherein the anode layer and the cathode layer comprise an electrolyte material, at least one metal and a catalyst...... material, and wherein the overall thickness of the thin reversible cell is about 150 [mu]m or less, and to a method for producing same. The present invention also relates to a thin and in principle unsupported solid oxide cell, comprising at least a porous anode layer, an electrolyte layer and a porous...... cathode layer, wherein the anode layer and the cathode layer comprise an electrolyte material and a catalyst material, wherein the electrolyte material is doper zirconia, and wherein the overall thickness of the thin reversible cell is about 150 [mu]m or less, and to a method for producing same...

  3. Homoepitaxial Branching: an unusual polymorph of Zinc Oxide Derived from seeded solution growth

    NARCIS (Netherlands)

    Kozhummal, Rajeevan; Yang, Yang; Güder, Firat; Hartel, Andreas; Lu, Xiaoli; Kücükbayrak, Umut M.; Mateo-Alonso, Aurelio; Elwenspoek, Michael Curt; Zacharias, Margit

    2012-01-01

    The development of hydrothermal synthesis has greatly promoted bottomup nanoscience for the rational growth of diverse zinc oxide (ZnO) nanostructures. In comparison with normal ZnO nanowires,ZnO nanostructures with a larger surface area, for instance, branched nanowires, are more attractive in the

  4. Thin film metal-oxides

    CERN Document Server

    Ramanathan, Shriram

    2009-01-01

    Presents an account of the fundamental structure-property relations in oxide thin films. This title discusses the functional properties of thin film oxides in the context of applications in the electronics and renewable energy technologies.

  5. Rare Earth Oxide Thin Films

    CERN Document Server

    Fanciulli, Marco

    2007-01-01

    Thin rare earth (RE) oxide films are emerging materials for microelectronic, nanoelectronic, and spintronic applications. The state-of-the-art of thin film deposition techniques as well as the structural, physical, chemical, and electrical properties of thin RE oxide films and of their interface with semiconducting substrates are discussed. The aim is to identify proper methodologies for the development of RE oxides thin films and to evaluate their effectiveness as innovative materials in different applications.

  6. Homoepitaxial growth of ZnO; Homoepitaxie von ZnO

    Energy Technology Data Exchange (ETDEWEB)

    Neumann, C.

    2006-08-15

    This thesis deals with the homoepitaxial growth of ZnO epitaxial thin-films. It starts with a theoretical consideration of this material system and shows how to establish a successful epitaxy. Then, the thesis shows the development of a CVD process with metallic zinc precursor and nitrogen dioxide as oxygen precursor. Finally, the physical properties of the realized epitaxial thin films are shown. Besides excellent crystalline and optical properties one finds the dependence of incorporation of atoms of the gaseous phase from the polarity of the ZnO growth polarity. (orig.)

  7. Heterogeneous nucleation of pits via step pinning during Si(100) homoepitaxy

    Science.gov (United States)

    Yitamben, E. N.; Butera, R. E.; Swartzentruber, B. S.; Simonson, R. J.; Misra, S.; Carroll, M. S.; Bussmann, E.

    2017-11-01

    Using scanning tunneling microscopy (STM), we investigate oxide-induced growth pits in Si thin films deposited by molecular beam epitaxy. In the transition temperature range from 2D adatom islanding to step-flow growth, systematic controlled air leaks into the growth chamber induce pits in the growth surface. We show that pits are also correlated with oxygen-contaminated flux from Si sublimation sources. From a thermodynamic standpoint, multilayer growth pits are unexpected in relaxed homoepitaxial growth, whereas oxidation is a known cause for step pinning, roughening, and faceting on elemental surfaces, both with and without growth flux. Not surprisingly, pits are thermodynamically metastable and heal by annealing to recover a smooth periodic step arrangement. STM reveals new details about the pits’ atomistic origins and growth dynamics. We give a model for heterogeneous nucleation of pits by preferential adsorption of Å-sized oxide nuclei at intrinsic growth antiphase boundaries, and subsequent step pinning and bunching around the nuclei.

  8. Zinc oxide thin film acoustic sensor

    Energy Technology Data Exchange (ETDEWEB)

    Mohammed, Ali Jasim; Salih, Wafaa Mahdi; Hassan, Marwa Abdul Muhsien; Nusseif, Asmaa Deiaa; Kadhum, Haider Abdullah [Department of Physics , College of Science, Al-Mustansiriyah University, Baghdad (Iraq); Mansour, Hazim Louis [Department of Physics , College of Education, Al-Mustansiriyah University, Baghdad (Iraq)

    2013-12-16

    This paper reports the implementation of (750 nm) thickness of Zinc Oxide (ZnO) thin film for the piezoelectric pressure sensors. The film was prepared and deposited employing the spray pyrolysis technique. XRD results show that the growth preferred orientation is the (002) plane. A polycrystalline thin film (close to mono crystallite like) was obtained. Depending on the Scanning Electron Microscopy photogram, the film homogeneity and thickness were shown. The resonance frequency measured (about 19 kHz) and the damping coefficient was calculated and its value was found to be about (2.5538), the thin film be haves as homogeneous for under and over damped. The thin film pressure sensing was approximately exponentially related with frequency, the thin film was observed to has a good response for mechanical stresses also it is a good material for the piezoelectric properties.

  9. Tuning thermal conductivity in homoepitaxial SrTiO{sub 3} films via defects

    Energy Technology Data Exchange (ETDEWEB)

    Brooks, Charles M. [Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853-1501 (United States); Department of Materials Science and Engineering, Pennsylvania State University, University Park, Pennsylvania 16802 (United States); Wilson, Richard B.; Cahill, David G. [Department of Materials Science and Engineering and Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801 (United States); Schäfer, Anna; Schubert, Jürgen [Peter Grünberg Institute (PGI9-IT), JARA-Fundamentals of Future Information Technology, Research Centre Jülich, D-52425 Jülich (Germany); Mundy, Julia A.; Holtz, Megan E. [School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853 (United States); Muller, David A. [School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853 (United States); Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853 (United States); Schlom, Darrell G. [Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853-1501 (United States); Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853 (United States)

    2015-08-03

    We demonstrate the ability to tune the thermal conductivity of homoepitaxial SrTiO{sub 3} films deposited by reactive molecular-beam epitaxy by varying growth temperature, oxidation environment, and cation stoichiometry. Both point defects and planar defects decrease the longitudinal thermal conductivity (k{sub 33}), with the greatest decrease in films of the same composition observed for films containing planar defects oriented perpendicular to the direction of heat flow. The longitudinal thermal conductivity can be modified by as much as 80%—from 11.5 W m{sup −1}K{sup −1} for stoichiometric homoepitaxial SrTiO{sub 3} to 2 W m{sup −1}K{sup −1} for strontium-rich homoepitaxial Sr{sub 1+δ}TiO{sub x} films—by incorporating (SrO){sub 2} Ruddlesden-Popper planar defects.

  10. Thin-Film Solid Oxide Fuel Cells

    Science.gov (United States)

    Chen, Xin; Wu, Nai-Juan; Ignatiev, Alex

    2009-01-01

    The development of thin-film solid oxide fuel cells (TFSOFCs) and a method of fabricating them have progressed to the prototype stage. This can result in the reduction of mass, volume, and the cost of materials for a given power level.

  11. Catalysis by Thin Oxide Films and Oxide Nanoparticles

    Science.gov (United States)

    Rupprechter, Günther; Penner, Simon

    Model systems for transition and noble metal oxide catalysts, either as thin films or nanoparticles, were prepared by vacuum-deposition of oxides or oxidation of metals (particles, thin films, single crystals). These systems, including Ga2O3, In2O3, V2O3, V2O5, Nb2O5, Pd5O4 and PdO, are well suited for atomic scale characterization by surface-specific methods and for catalytic tests. Investigations of structure and composition were carried out by HRTEM, AFM, STM, SAED, LEED, EDX, XPS and DFT. In many cases, the surface structure of oxides does not coincide with truncations of the known bulk structures. The adsorption properties of the oxide models, in particular those of defects such as oxygen vacancies or step edges, were examined by vibrational spectroscopy (FTIR and SFG) and thermal desorption spectroscopy (TPD) of probe molecules (CO, H2, propane and propene). Together with XPS, quantification of surface coverage was performed. The catalytic activity and selectivity of the model oxides at (near) ambient gas pressure were investigated by microreactor studies of methanol steam reforming (MSR), (inverse) water gas shift (WGS) and CO oxidation. The structural/compositional flexibility of oxides leads to significant challenges in their characterization but also imparts them with exceptional catalytic properties.

  12. Review of Zinc Oxide Thin Films

    Science.gov (United States)

    2014-12-23

    oriented ZnO:Ga  thin   films   deposited  on  glass  by  laser   ablation   at  different  deposition  temperatures.  The  surface  morphology,  crystalline...Standard Form 298 (Rev. 8/98) Prescribed by ANSI Std. Z39.18 1    Review of Zinc Oxide Thin Films   Abstract  The present review  paper  reports on the...resistivity provided by indium‐doped  tin  oxide (ITO)  ~ 0.7 x 10‐4 Ω‐cm achieved by deposition of  ITO  films  on glass at 300 oC by pulsed  Laser

  13. Galvanostatic Ion Detrapping Rejuvenates Oxide Thin Films.

    Science.gov (United States)

    Arvizu, Miguel A; Wen, Rui-Tao; Primetzhofer, Daniel; Klemberg-Sapieha, Jolanta E; Martinu, Ludvik; Niklasson, Gunnar A; Granqvist, Claes G

    2015-12-09

    Ion trapping under charge insertion-extraction is well-known to degrade the electrochemical performance of oxides. Galvanostatic treatment was recently shown capable to rejuvenate the oxide, but the detailed mechanism remained uncertain. Here we report on amorphous electrochromic (EC) WO3 thin films prepared by sputtering and electrochemically cycled in a lithium-containing electrolyte under conditions leading to severe loss of charge exchange capacity and optical modulation span. Time-of-flight elastic recoil detection analysis (ToF-ERDA) documented pronounced Li(+) trapping associated with the degradation of the EC properties and, importantly, that Li(+) detrapping, caused by a weak constant current drawn through the film for some time, could recover the original EC performance. Thus, ToF-ERDA provided direct and unambiguous evidence for Li(+) detrapping.

  14. Transparent Conductive Oxides in Thin Film Photovoltaics

    Science.gov (United States)

    Hamelmann, Frank U.

    2014-11-01

    This paper show results from the development of transparent conductive oxides (TCO's) on large areas for the use as front electrode in thin film silicon solar modules. It is focused on two types of zinc oxide, which are cheap to produce and scalable to a substrate size up to 6 m2. Low pressure CVD with temperatures below 200°C can be used for the deposition of boron doped ZnO with a native surface texture for good light scattering, while sputtered aluminum doped ZnO needs a post deposition treatment in an acid bath for a rough surface. The paper presents optical and electrical characterization of large area samples, and also results about long term stability of the ZnO samples with respect to the so called TCO corrosion.

  15. Synthesis and characterization of zinc oxide thin films prepared by ...

    African Journals Online (AJOL)

    Synthesis and characterization of zinc oxide thin films prepared by chemical the bath technique. ... The band gap energy of the samples deduced from the fundamental absorption edge gave the values of 1.60 – 2.80 eV for the direct ... Keywords: Chemical bath technique, zinc oxide thin films, x-ray, photovoltaic cells ...

  16. Chemical solution deposition of functional oxide thin films

    CERN Document Server

    Schneller, Theodor; Kosec, Marija

    2014-01-01

    Chemical Solution Deposition (CSD) is a highly-flexible and inexpensive technique for the fabrication of functional oxide thin films. Featuring nearly 400 illustrations, this text covers all aspects of the technique.

  17. Determination of oxygen diffusion kinetics during thin film ruthenium oxidation

    NARCIS (Netherlands)

    Coloma Ribera, R.; van de Kruijs, Robbert Wilhelmus Elisabeth; Yakshin, Andrey; Bijkerk, Frederik

    2015-01-01

    In situ X-ray reflectivity was used to reveal oxygen diffusion kinetics for thermal oxidation of polycrystalline ruthenium thin films and accurate determination of activation energies for this process. Diffusion rates in nanometer thin RuO2 films were found to show Arrhenius behaviour. However, a

  18. CO2 gas sensitivity of sputtered zinc oxide thin films

    Indian Academy of Sciences (India)

    TECS

    Abstract. For the first time, sputtered zinc oxide (ZnO) thin films have been used as a CO2 gas sensor. Zinc oxide thin films have been synthesized using reactive d.c. sputtering method for gas sensor applications, in the deposition temperature range from 130–153°C at a chamber pressure of 8⋅5 mbar for 18 h. Argon and ...

  19. Active Oxygen Generator by Silent Discharge and Oxidation Power in Formation of Oxide Thin Films

    Science.gov (United States)

    Tanaka, Masaaki; Kawagoe, Yasuyuki; Tsukazaki, Hisashi; Yamanishi, Kenichiro

    We have studied the low pressure silent discharge type active oxygen generator in terms of the application to the formation of oxide thin films. In this paper the oxidation power of active oxygen in the oxide thin film formation is compared with that of oxygen and ozone by forming silicon oxide thin films. It was confirmed that the oxidation power is in turn of active oxygen > ozone > oxygen from the experimental result of the number of x in SiOx thin film. Furthermore we applied active oxygen to the formation of the thin film high temperature super conductor and active oxygen was found to be effective to the formation of the thin film with high performance.

  20. Oxide-based thin film transistors for flexible electronics

    Science.gov (United States)

    He, Yongli; Wang, Xiangyu; Gao, Ya; Hou, Yahui; Wan, Qing

    2018-01-01

    The continuous progress in thin film materials and devices has greatly promoted the development in the field of flexible electronics. As one of the most common thin film devices, thin film transistors (TFTs) are significant building blocks for flexible platforms. Flexible oxide-based TFTs are well compatible with flexible electronic systems due to low process temperature, high carrier mobility, and good uniformity. The present article is a review of the recent progress and major trends in the field of flexible oxide-based thin film transistors. First, an introduction of flexible electronics and flexible oxide-based thin film transistors is given. Next, we introduce oxide semiconductor materials and various flexible oxide-based TFTs classified by substrate materials including polymer plastics, paper sheets, metal foils, and flexible thin glass. Afterwards, applications of flexible oxide-based TFTs including bendable sensors, memories, circuits, and displays are presented. Finally, we give conclusions and a prospect for possible development trends. Project supported in part by the National Science Foundation for Distinguished Young Scholars of China (No. 61425020), in part by the National Natural Science Foundation of China (No. 11674162).

  1. Characterizations of photoconductivity of graphene oxide thin films

    Directory of Open Access Journals (Sweden)

    Shiang-Kuo Chang-Jian

    2012-06-01

    Full Text Available Characterizations of photoresponse of a graphene oxide (GO thin film to a near infrared laser light were studied. Results showed the photocurrent in the GO thin film was cathodic, always flowing in an opposite direction to the initial current generated by the preset bias voltage that shows a fundamental discrepancy from the photocurrent in the reduced graphene oxide thin film. Light illumination on the GO thin film thus results in more free electrons that offset the initial current. By examining GO thin films reduced at different temperatures, the critical temperature for reversing the photocurrent from cathodic to anodic was found around 187°C. The dynamic photoresponse for the GO thin film was further characterized through the response time constants within the laser on and off durations, denoted as τon and τoff, respectively. τon for the GO thin film was comparable to the other carbon-based thin films such as carbon nanotubes and graphenes. τoff was, however, much larger than that of the other's. This discrepancy was attributable to the retardation of exciton recombination rate thanks to the existing oxygen functional groups and defects in the GO thin films.

  2. Spatial atomic layer deposition of zinc oxide thin films

    NARCIS (Netherlands)

    Illiberi, A.; Roozeboom, F.; Poodt, P.W.G.

    2012-01-01

    Zinc oxide thin films have been deposited at high growth rates (up to ~1 nm/s) by spatial atomic layer deposition technique at atmospheric pressure. Water has been used as oxidant for diethylzinc (DEZ) at deposition temperatures between 75 and 250 °C. The electrical, structural (crystallinity and

  3. Epitaxial oxide thin films by pulsed laser deposition: Retrospect and ...

    Indian Academy of Sciences (India)

    component oxide films. Highly stoichiometric, nearly single crystal-like materials in the form of films can be made by PLD. Oxides which are synthesized at high oxygen pressure can be made into films at low oxygen partial pressure. Epitaxial thin films ...

  4. Deposition and characterisation of epitaxial oxide thin films for SOFCs

    KAUST Repository

    Santiso, José

    2010-10-24

    This paper reviews the recent advances in the use of thin films, mostly epitaxial, for fundamental studies of materials for solid oxide fuel cell (SOFC) applications. These studies include the influence of film microstructure, crystal orientation and strain in oxide ionic conducting materials used as electrolytes, such as fluorites, and in mixed ionic and electronic conducting materials used as electrodes, typically oxides with perovskite or perovskite-related layered structures. The recent effort towards the enhancement of the electrochemical performance of SOFC materials through the deposition of artificial film heterostructures is also presented. These thin films have been engineered at a nanoscale level, such as the case of epitaxial multilayers or nanocomposite cermet materials. The recent progress in the implementation of thin films in SOFC devices is also reported. © 2010 Springer-Verlag.

  5. Pulsed photonic fabrication of nanostructured metal oxide thin films

    Science.gov (United States)

    Bourgeois, Briley B.; Luo, Sijun; Riggs, Brian C.; Adireddy, Shiva; Chrisey, Douglas B.

    2017-09-01

    Nanostructured metal oxide thin films with a large specific surface area are preferable for practical device applications in energy conversion and storage. Herein, we report instantaneous (milliseconds) photonic synthesis of three-dimensional (3-D) nanostructured metal oxide thin films through the pulsed photoinitiated pyrolysis of organometallic precursor films made by chemical solution deposition. High wall-plug efficiency-pulsed photonic irradiation (xenon flash lamp, pulse width of 1.93 ms, fluence of 7.7 J/cm2 and frequency of 1.2 Hz) is used for scalable photonic processing. The photothermal effect of subsequent pulses rapidly improves the crystalline quality of nanocrystalline metal oxide thin films in minutes. The following paper highlights pulsed photonic fabrication of 3-D nanostructured TiO2, Co3O4, and Fe2O3 thin films, exemplifying a promising new method for the low-cost and high-throughput manufacturing of nanostructured metal oxide thin films for energy applications.

  6. Subwavelength grating-mirror VCSEL with a thin oxide gap

    DEFF Research Database (Denmark)

    Chung, Il-Sug; Mørk, Jesper; Gilet, Philippe

    2008-01-01

    A new vertical-cavity surface-emitting laser (VCSEL) structure based on a subwavelength grating mirror and a thin oxide gap is suggested and numerically investigated. The structure is shown to exhibit similar threshold gain, suppression of higher order transverse modes, and polarization stability...... as a grating-mirror VCSEL reported in the literature based on a thick air gap. The thin oxide gap structure has a number of advantages including easier fabrication, better mechanical stability, and very strong single-mode properties....

  7. Multiferroic oxide thin films and heterostructures

    Science.gov (United States)

    Lu, Chengliang; Hu, Weijin; Tian, Yufeng; Wu, Tom

    2015-06-01

    Multiferroic materials promise a tantalizing perspective of novel applications in next-generation electronic, memory, and energy harvesting technologies, and at the same time they also represent a grand scientific challenge on understanding complex solid state systems with strong correlations between multiple degrees of freedom. In this review, we highlight the opportunities and obstacles in growing multiferroic thin films with chemical and structural integrity and integrating them in functional devices. Besides the magnetoelectric effect, multiferroics exhibit excellent resistant switching and photovoltaic properties, and there are plenty opportunities for them to integrate with other ferromagnetic and superconducting materials. The challenges include, but not limited, defect-related leakage in thin films, weak magnetism, and poor control on interface coupling. Although our focuses are Bi-based perovskites and rare earth manganites, the insights are also applicable to other multiferroic materials. We will also review some examples of multiferroic applications in spintronics, memory, and photovoltaic devices.

  8. Multiferroic oxide thin films and heterostructures

    KAUST Repository

    Lu, Chengliang

    2015-05-26

    Multiferroic materials promise a tantalizing perspective of novel applications in next-generation electronic, memory, and energy harvesting technologies, and at the same time they also represent a grand scientific challenge on understanding complex solid state systems with strong correlations between multiple degrees of freedom. In this review, we highlight the opportunities and obstacles in growing multiferroic thin films with chemical and structural integrity and integrating them in functional devices. Besides the magnetoelectric effect, multiferroics exhibit excellent resistant switching and photovoltaic properties, and there are plenty opportunities for them to integrate with other ferromagnetic and superconducting materials. The challenges include, but not limited, defect-related leakage in thin films, weak magnetism, and poor control on interface coupling. Although our focuses are Bi-based perovskites and rare earth manganites, the insights are also applicable to other multiferroic materials. We will also review some examples of multiferroic applications in spintronics, memory, and photovoltaic devices.

  9. Study of zinc oxide thin film characteristics

    Science.gov (United States)

    Johari, Shazlina; Yazmin Muhammad, Nazalea; Rosydi Zakaria, Mohd

    2017-11-01

    This paper presents the characterization of ZnO thin films with the thickness of 8nm, 30nm, and 200nm. The thin films were prepared using sol-gel method and has been deposited onto different substrate of silicon wafer, glass and quartz. The thin films were annealed at 400, 500 and 600°C. By using UV-Vis, the optical transmittance measurement were recorded by using a single beam spectrophotometer in the wavelength 250nm to 800nm. However, the transmittance in the visible range is hardly influenced by the film thickness, substrate used and annealed temperature and the averages are all above 80%. On surface morphology observed by AFM and FESEM, the results show that the increase of film thickness and annealed temperature will increase the mean grain size, surface-to-volume ration and RMS roughness. Besides that, higher annealing temperature cause the crystalline quality to gradually improve and the wurtzite structure of ZnO can be seen more clearly. Nonetheless, the substrate used had no effect on surface morphology, yet the uniformity of deposition on silicon wafer is better than glass and quartz.

  10. Characterization of molybdenum-doped indium oxide thin films by ...

    Indian Academy of Sciences (India)

    index, extension coefficient and bandgap of these films also were investigated. Keywords. Molybdenum-doped indium oxide; spray pyrolysis; thin films. 1. Introduction. Transparent conducting oxide (TCOs) films such as In2O3,. ZnO, SnO2 and In2O3:Sn (ITO), In2O3:Mo (IMO), etc due to their high optical transparency in the ...

  11. Optical characteristics of transparent samarium oxide thin films ...

    Indian Academy of Sciences (India)

    Optical characteristics of transparent samarium oxide thin films deposited by the radio-frequency sputtering technique. A A ATTA M M EL-NAHASS KHALED M ELSABAWY M M ABD EL-RAHEEM A M HASSANIEN A ALHUTHALI ALI BADAWI AMAR MERAZGA. Regular Volume 87 Issue 5 November 2016 Article ID 72 ...

  12. Optical characterisation of thin film cadmium oxide prepared by a ...

    African Journals Online (AJOL)

    The optical transmission spectra of transparent conducting cadmium oxide (CdO) thin films deposited by a modified reactive evaporation process onto glass substrates have been measured. The interference fringes were used to calculate the refractive index, thickness variation, average thickness and absorption coefficient ...

  13. Transparent conductive oxides for thin-film silicon solar cells

    NARCIS (Netherlands)

    Löffler, J.

    2005-01-01

    This thesis describes research on thin-film silicon solar cells with focus on the transparent conductive oxide (TCO) for such devices. In addition to the formation of a transparent and electrically conductive front electrode for the solar cell allowing photocurrent collection with low ohmic losses,

  14. solution growth and characterization of copper oxide thin films ...

    African Journals Online (AJOL)

    Thin films of copper oxide (CuO) were grown on glass slides by using the solution growth technique. Copper cloride (CuCl ) and potassium telluride (K T O ) were used. Buffer 2 2e 3 solution was used as complexing agent. The solid state properties and optical properties were obtained from characterization done using PYE ...

  15. Surface Morphology of Zinc Oxide Thin Films deposited by TCVD

    Science.gov (United States)

    Rafaie, H. A.; Noor, F. W. M.; Amizam, S.; Abdullah, S.; Rusop, M.

    2010-03-01

    Surface morphology study of Zinc Oxide (ZnO) thin films by using Thermal Chemical Vapor Deposition (Thermal-CVD) was investigated. The ZnO compound was synthesized from zinc acetate dehydrate which act as a starting material to form the ZnO thin films. It was deposited on as-prepared Nanonstructured Silicon (NSi) with deposition temperature ranging from 400-600° C without catalyst-assisted. The surface morphology of the samples before and after the deposition process was examined by using Analytical Scanning Electron Microscope (SEM). The result shows that the obtained ZnO thin films possess good crystalline structure at deposition temperature of 600° C and the surface morphologies of the ZnO thin films improved greatly with an increase in deposition temperature. XRD was employed to study the evolution of the crystalline orientation using X-Ray Diffractrometer (XRD).

  16. Thin film zinc oxide deposited by CVD and PVD

    Science.gov (United States)

    Hamelmann, Frank U.

    2016-10-01

    Zinc oxide is known as a mineral since 1810, but it came to scientific interest after its optoelectronic properties found to be tuneable by p-type doping. Since the late 1980’s the number of publications increased exponentially. All thin film deposition technologies, including sol-gel and spray pyrolysis, are able to produce ZnO films. However, for outstanding properties and specific doping, only chemical vapor deposition and physical vapor deposition have shown so far satisfying results in terms of high conductivity and high transparency. In this paper the different possibilities for doping will be discussed, some important applications of doped ZnO thin films will be presented. The deposition technologies used for industrial applications are shown in this paper. Especially sputtering of aluminium doped Zinc Oxide (ZnO:Al or AZO) and LPCVD of boron doped Zinc Oxide (ZnO:B or BZO) are used for the commercial production of transparent conductive oxide films on glass used for thin film photovoltaic cells. For this special application the typical process development for large area deposition is presented, with the important trade-off between optical properties (transparency and ability for light scattering) and electrical properties (conductivity). Also, the long term stability of doped ZnO films is important for applications, humidity in the ambient is often the reason for degradation of the films. The differences between the mentioned materials are presented.

  17. Metal Doped Manganese Oxide Thin Films for Supercapacitor Application.

    Science.gov (United States)

    Tung, Mai Thanh; Thuy, Hoang Thi Bich; Hang, Le Thi Thu

    2015-09-01

    Co and Fe doped manganese oxide thin films were prepared by anodic deposition at current density of 50 mA cm(-2) using the electrolyte containing manganese sulfate and either cobalt sulfate or ferrous sulfate. Surface morphology and crystal structure of oxides were studied by scanning electron microscope (SEM) and X-ray diffraction (XRD). Chemical composition of materials was analyzed by X-ray energy dispersive spectroscope (EDS), iodometric titration method and complexometric titration method, respectively. Supercapacitive behavior of Co and Fe doped manganese oxide films were characterized by cyclic voltammetry (CV) and impedance spectroscopy (EIS). The results show that the doped manganese oxides are composed of nano fiber-like structure with radius of 5-20 nm and remain amorphous structure after heat treatment at 100 degrees C for 2 hours. The average valence of manganese increases from +3.808 to +3.867 after doping Co and from +3.808 to +3.846 after doping Fe. The doped manganese oxide film electrodes exhibited preferably ideal pseudo-capacitive behavior. The specific capacitance value of deposited manganese oxide reaches a maximum of 175.3 F/g for doping Co and 244.6 F/g for doping Fe. The thin films retained about 84% of the initial capacity even after 500 cycles of charge-discharge test. Doping Co and Fe decreases diffusion and charge transfer resistance of the films. The electric double layer capacitance and capacitor response frequency are increased after doping.

  18. Cuprous oxide thin films grown by hydrothermal electrochemical deposition technique

    Energy Technology Data Exchange (ETDEWEB)

    Majumder, M., E-mail: mousumi@cgcri.res.in; Biswas, I.; Pujaru, S.; Chakraborty, A.K.

    2015-08-31

    Semiconducting cuprous oxide films were grown by a hydrothermal electro-deposition technique on metal (Cu) and glass (ITO) substrates between 60 °C and 100 °C. X-ray diffraction studies reveal the formation of cubic cuprous oxide films in different preferred orientations depending upon the deposition technique used. Film growth, uniformity, grain size, optical band gap and photoelectrochemical response were found to improve in the hydrothermal electrochemical deposition technique. - Highlights: • Cu{sub 2}O thin films were grown on Cu and glass substrates. • Conventional and hydrothermal electrochemical deposition techniques were used. • Hydrothermal electrochemical growth showed improved morphology, thickness and optical band gap.

  19. Tantalum oxide thin films as protective coatings for sensors

    DEFF Research Database (Denmark)

    Christensen, Carsten; Reus, Roger De; Bouwstra, Siebe

    1999-01-01

    Reactively sputtered tantalum oxide thin-films have been investigated as protective coating for aggressive media exposed sensors. Tantalum oxide is shown to be chemically very robust. The etch rate in aqueous potassium hydroxide with pH 11 at 140°C is lower than 0.008 Å/h. Etching in liquids with p......H values in the range from pH 2-11 have generally given etch rates below 0.04 Å/h. On the other hand patterning is possible in hydrofluoric acid. Further, the passivation behaviour of amorphous tantalum oxide and polycrystalline Ta2O5 is different in buffered hydrofluoric acid. By ex-situ annealing in O2...... the residual thin-film stress can be altered from compressive to tensile and annealing at 450°C for 30 minutes gives a stress-free film. The step coverage of the sputter deposited amorphous tantalum oxide is reasonable, but metallisation lines are hard to cover. Sputtered tantalum oxide exhibits high...

  20. Tantalum oxide thin films as protective coatings for sensors

    DEFF Research Database (Denmark)

    Christensen, Carsten; Reus, Roger De; Bouwstra, Siebe

    1999-01-01

    Reactively sputtered tantalum oxide thin films have been investigated as protective coatings for aggressive media exposed sensors. Tantalum oxide is shown to be chemically very robust. The etch rate in aqueous potassium hydroxide with pH 11 at 140°C is lower than 0.008 Å h-l. Etching in liquids...... with pH values in the range from pH 2 to 11 have generally given etch rates below 0.04 Å h-l. On the other hand patterning is possible in hydrofluoric acid. Further, the passivation behaviour of amorphous tantalum oxide and polycrystalline Ta2O5 is different in buffered hydrofluoric acid. By ex situ...... annealing O2 in the residual thin-film stress can be altered from compressive to tensile and annealing at 450°C for 30 minutes gives a stress-free film. The step coverage of the sputter deposited amorphous tantalum oxide is reasonable, but metallization lines are hard to cover. Sputtered tantalum oxide...

  1. Multiferroic iron oxide thin films at room temperature.

    Science.gov (United States)

    Gich, Martí; Fina, Ignasi; Morelli, Alessio; Sánchez, Florencio; Alexe, Marin; Gàzquez, Jaume; Fontcuberta, Josep; Roig, Anna

    2014-07-16

    Multiferroic behaviour at room temperature is demonstrated in ε-Fe2 O3 . The simple composition of this new ferromagnetic ferroelectric oxide and the discovery of a robust path for its thin film growth by using suitable seed layers may boost the exploitation of ε-Fe2 O3 in novel devices. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  2. Gated Conductance of Thin Indium Tin Oxide - The Simplest Transistor

    OpenAIRE

    Jiang, Jie; Wan, Qing; Sun, Jia; Dou, Wei; Zhang, Qing

    2012-01-01

    Transistors are the fundamental building block of modern electronic devices. So far, all transistors are based on various types of semiconductor junctions. The most common bipolar-junction transistors and metal-oxide-semiconductor field-effect transistors contain p-n junctions to control the current, depending on applied biases across the junctions. Thin-film transistors need metal-semiconductor junctions for injecting and extracting electrons from their channels. Here, by coating a heavily-d...

  3. Structural and Electrochemical Properties of Lithium Nickel Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    Gyu-bong Cho

    2014-01-01

    Full Text Available LiNiO2 thin films were fabricated by RF magnetron sputtering. The microstructure of the films was determined by X-ray diffraction and field-emission scanning electron microscopy. The electrochemical properties were investigated with a battery cycler using coin-type half-cells. The LiNiO2 thin films annealed below 500°C had the surface carbonate. The results suggest that surface carbonate interrupted the Li intercalation and deintercalation during charge/discharge. Although the annealing process enhanced the crystallization of LiNiO2, the capacity did not increase. When the annealing temperature was increased to 600°C, the FeCrNiO4 oxide phase was generated and the discharge capacity decreased due to an oxygen deficiency in the LiNiO2 thin film. The ZrO2-coated LiNiO2 thin film provided an improved discharge capacity compared to bare LiNiO2 thin film suggesting that the improved electrochemical characteristic may be attributed to the inhibition of surface carbonate by ZrO2 coating layer.

  4. Structural, electronic and chemical properties of metal/oxide and oxide/oxide interfaces and thin film structures

    Energy Technology Data Exchange (ETDEWEB)

    Lad, Robert J.

    1999-12-14

    This project focused on three different aspects of oxide thin film systems: (1) Model metal/oxide and oxide/oxide interface studies were carried out by depositing ultra-thin metal (Al, K, Mg) and oxide (MgO, AlO{sub x}) films on TiO{sub 2}, NiO and {alpha}-Al{sub 2}O{sub 3} single crystal oxide substrates. (2) Electron cyclotron resonance (ECR) oxygen plasma deposition was used to fabricate AlO{sub 3} and ZrO{sub 2} films on sapphire substrates, and film growth mechanisms and structural characteristics were investigated. (3) The friction and wear characteristics of ZrO{sub 2} films on sapphire substrates in unlubricated sliding contact were studied and correlated with film microstructure. In these studies, thin film and interfacial regions were characterized using diffraction (RHEED, LEED, XRD), electron spectroscopies (XPS, UPS, AES), microscopy (AFM) and tribology instruments (pin-on-disk, friction microprobe, and scratch tester). By precise control of thin film microstructure, an increased understanding of the structural and chemical stability of interface regions and tribological performance of ultra-thin oxide films was achieved in these important ceramic systems.

  5. The synthesis and characterization of multifunctional oxide thin films

    Science.gov (United States)

    Kharel, Parashu Ram

    2008-10-01

    Multifunctional materials offer a number of very interesting properties for developing new generation novel devices. Motivated by this fact, we concentrated our research efforts on investigating two different class of multifunctional materials namely: Diluted Magnetic Semiconducting Oxides (DMSO) and Multiferroic Oxides. The primary goal of this study was to determine how to resolve the controversy concerning the origin of room temperature ferromagnetic order in DMSO and to demonstrate the theoretically predicted coupling between ferroelectric and magnetic order parameters in multiferroic oxides. We chose several materials of current interest such as TiO2, ZnOand In2O3 (DMSO) and Ni3V2O8 and BiFeO 3 (multiferroic oxides) as the experimental specimens. We synthesized thin film samples of these materials using metal organic decomposition by spin coating and RF magnetron sputtering techniques. We succeeded in growing single phase polycrystalline thin films using both of the techniques with the sputter deposited samples showing highly preferred orientations. We did not observe any secondary phases and accidental impurities leading to robust ferromagnetic order in our samples within the detection limit of XRD, Raman spectroscopy and TEM. We have demonstrated that the lattice defects such as oxygen vacancies and cation vacancies play crucial role in the development of ferromagnetic order in DMSO materials. Based on the investigation carried out on TiO 2, ZnO and In2O3, we conclude that ferromagnetism can be developed in oxygen deficient DMSO thin films without the subbstitution of any external magnetic impurities but the incorporation of magnetic impurities may help in stabilizing the observed ferromagnetic order. Most importantly, we demonstrated with the direct measurement of spin polarization in In 2O3 and Cr doped In2O3 thin films that the charge carriers responsible for the ferromagnetic order are spin polarized. We have successfully demonstrated that the low

  6. Amorphous nickel incorporated tin oxide thin film transistors

    Science.gov (United States)

    Yang, Jianwen; Ren, Jinhua; Lin, Dong; Han, Yanbing; Qu, Mingyue; Pi, Shubin; Fu, Ruofan; Zhang, Qun

    2017-09-01

    Nickel as a dopant has been proposed to suppress excess carrier concentration in n-type tin oxide based thin film transistors (TFTs). The influences of Ni content on nickel doped tin oxide (TNO) thin films and their corresponding TFTs were investigated with experimental results showing that the TNO thin films are amorphous. Through the comparison of the transfer characteristic curves of the TNO TFTs with different Ni contents, it was observed that Ni doping is useful to improve the performance of SnO2-based TFTs by suppressing the off-state current and shifting the threshold voltage to 0 V. The amorphous TNO TFT with 3.3 at.% Ni content shows optimum performance, with field effect mobility of 8.4 cm2 V-1 s-1, saturation mobility of 6.8 cm2 V-1 s-1, subthreshold swing value of 0.8 V/decade, and an on-off current ratio of 2.1  ×  107. Nevertheless, the bias stress stability of SnO2-based TFTs deteriorate.

  7. Properties of Spray Pyrolysied Copper Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    S. S. Roy

    2017-02-01

    Full Text Available Copper oxide (CuO thin films were deposited on well cleaned glass substrates by spray pyrolysis technique (SPT from cupric acetate (Cu(CH3COO2.H2O precursor solutions of 0.05 – 0.15 M molar concentrations (MC at a substrate temperature of 350 °C and at an air pressure of 1 bar. Effect of varying MC on the surface morphology, structural optical and electrical properties of CuO thin films were investigated. XRD patterns of the prepared films revealed the formation of CuO thin films having monoclinic structure with the main CuO (111 orientation and crystalline size ranging from 8.02 to 9.05 nm was observed. The optical transmission of the film was found to decrease with the increase of MC. The optical band gap of the thin films for 0.10 M was fond to be 1.60 eV. The room temperature electrical resistivity varies from 31 and 24 ohm.cm for the films grown with MC of 0.05 and 0.10 M respectively. The change in resistivity of the films was studied with respect to the change in temperature was shown that semiconductor nature is present. This information is expected to underlie the successful development of CuO films for solar windows and other semi-conductor applications including gas sensors.

  8. Ferroelectric thin films using oxides as raw materials

    Directory of Open Access Journals (Sweden)

    E.B. Araújo

    1999-01-01

    Full Text Available This work describes an alternative method for the preparation of ferroelectric thin films based on pre-calcination of oxides, to be used as precursor material for a solution preparation. In order to show the viability of the proposed method, PbZr0.53Ti0.47O3 and Bi4Ti3O12 thin films were prepared on fused quartz and Si substrates. The results were analyzed by X-ray Diffraction (XRD, Scanning Electron Microscopy (SEM, Infrared Spectroscopy (IR and Rutherford Backscattering Spectroscopy (RBS. The films obtained show good quality, homogeneity and the desired stoichiometry. The estimated thickness for one layer deposition was approximately 1000 Å and 1500 Å for Bi4Ti3O12 and PbZr0.53Ti0.47O3 films, respectively.

  9. Amorphous Hafnium-Indium-Zinc Oxide Semiconductor Thin Film Transistors

    Directory of Open Access Journals (Sweden)

    Sheng-Po Chang

    2012-01-01

    Full Text Available We reported on the performance and electrical properties of co-sputtering-processed amorphous hafnium-indium-zinc oxide (α-HfIZO thin film transistors (TFTs. Co-sputtering-processed α-HfIZO thin films have shown an amorphous phase in nature. We could modulate the In, Hf, and Zn components by changing the co-sputtering power. Additionally, the chemical composition of α-HfIZO had a significant effect on reliability, hysteresis, field-effect mobility (μFE, carrier concentration, and subthreshold swing (S of the device. Our results indicated that we could successfully and easily fabricate α-HfIZO TFTs with excellent performance by the co-sputtering process. Co-sputtering-processed α-HfIZO TFTs were fabricated with an on/off current ratio of ~106, higher mobility, and a subthreshold slope as steep as 0.55 V/dec.

  10. Low Temperature, High Energy Density Micro Thin Film Solid Oxide Fuel Cell Project

    Data.gov (United States)

    National Aeronautics and Space Administration — A new type of solid oxide fuel cell based on thin film technology and ultra-thin electrolyte is being proposed to develop to realize major reductions in fuel cell...

  11. Homoepitaxial growth of gallium nitride films using seeded supersonic molecular beams

    Science.gov (United States)

    McGinnis, Arthur J.

    Homoepitaxial GaN thin films were grown on MOCVD GaN(0001)/A1N/6H-SiC substrates using NH3, elemental Ga and TEG. The GaN growth kinetics were probed using NH3-seeded and TEG-seeded supersonic molecular beams. A GaN surface kinetics model for growth using NH3 and elemental Ga was fitted with the data to find the zero-coverage NH3 sticking coefficient. Growth rates measured under NH3-limited conditions using hyperthermal NH3 beams with kinetic energies of 0.08--1.8 eV indicate decreasing nitrogen incorporation efficiency with increasing incident kinetic energy. The results indicate that NH3 chemisorption on GaN(0001) is unactivated and occurs via a precursor-mediated pathway. The surface morphology is controlled by the Ga surface diffusion length, which in turn, is controlled primarily by the GaN growth rate. Scaling analysis indicates surface diffusion as the dominant transport mechanism that competes with stochastic roughening. NH3 incident kinetic energies in the 0.4--1.8 eV range did not have a direct effect on surface morphology but an indirect influence via NH3 reactivity modulation. Two-dimensional GaN films were grown by chemical beam epitaxy using TEG-seeded supersonic molecular beams and NH3 from a leak valve. TEM analysis indicated that GaN films were homoepitaxially grown on GaN(0001) substrates but have a high density of planar defects. Substrate temperature was the primary variable in reducing carbon contamination in the films. The dissociative chemisorption pathway of triethylgallium on GaN(0001) also appears to be precursor-mediated.

  12. Nanoscale reduction of graphene oxide thin films and its characterization

    KAUST Repository

    Lorenzoni, M.

    2015-06-29

    In this paper, we report on a method to reduce thin films of graphene oxide (GO) to a spatial resolution better than 100 nm over several tens of micrometers by means of an electrochemical scanning probe based lithography. In situ tip-current measurements show that an edged drop in electrical resistance characterizes the reduced areas, and that the reduction process is, to a good approximation, proportional to the applied bias between the onset voltage and the saturation thresholds. An atomic force microscope (AFM) quantifies the drop of the surface height for the reduced profile due to the loss of oxygen. Complementarily, lateral force microscopy reveals a homogeneous friction coefficient of the reduced regions that is remarkably lower than that of native graphene oxide, confirming a chemical change in the patterned region. Micro Raman spectroscopy, which provides access to insights into the chemical process, allows one to quantify the restoration and de-oxidation of the graphitic network driven by the electrochemical reduction and to determine characteristic length scales. It also confirms the homogeneity of the process over wide areas. The results shown were obtained from accurate analysis of the shift, intensity and width of Raman peaks for the main vibrational bands of GO and reduced graphene oxide (rGO) mapped over large areas. Concerning multilayered GO thin films obtained by drop-casting we have demonstrated an unprecedented lateral resolution in ambient conditions as well as an improved control, characterization and understanding of the reduction process occurring in GO randomly folded multilayers, useful for large-scale processing of graphene-based material. © 2015 IOP Publishing Ltd.

  13. High Transparent Conductive Aluminum-Doped Zinc Oxide Thin Films by Reactive Co-Sputtering (Postprint)

    Science.gov (United States)

    2016-03-30

    AFRL-RX-WP-JA-2017-0144 HIGH TRANSPARENT CONDUCTIVE ALUMINUM- DOPED ZINC OXIDE THIN FILMS BY REACTIVE CO- SPUTTERING (POSTPRINT...TRANSPARENT CONDUCTIVE ALUMINUM-DOPED ZINC OXIDE THIN FILMS BY REACTIVE CO-SPUTTERING (POSTPRINT) 5a. CONTRACT NUMBER FA8650-16-D-5402-0001 5b. GRANT...ANSI Std. Z39-18 TD.11.pdf Optical Interference Coatings (OIC) 2016 © OSA 2016 1 High Transparent Conductive Aluminum-doped Zinc Oxide Thin

  14. Development of thickness measurement program for transparent conducting oxide thin films

    OpenAIRE

    Mitsugi, Fumiaki; Matsuoka, Aya; Umeda, Yoshihiro; Ikegami, Tomoaki; ミツギ, フミアキ; マツオカ, アヤ; ウメダ, ヨシヒロ; イケガミ, トモアキ; 光木, 文秋; 松岡, 綾; 梅田, 佳宏; 池上, 知顯

    2010-01-01

    The gallium doped zinc oxide has been one of the candidates for the transparent conducting oxide thin film electrode. It is not suitable to use a conventional light interference method to measure the thickness of the gallium doped zinc oxide thin film because the refractive index and extinction coefficient of the thin film is unknown during the optimization of the deposition conditions. In this paper, we report on the details of the film thickness program which uses the measured optical and e...

  15. Electrochromic Devices Based on Porous Tungsten Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    Y. Djaoued

    2012-01-01

    Full Text Available Recent developments in the synthesis of transition metal oxides in the form of porous thin films have opened up opportunities in the construction of electrochromic devices with enhanced properties. In this paper, synthesis, characterization and electrochromic applications of porous WO3 thin films with different nanocrystalline phases, such as hexagonal, monoclinic, and orthorhombic, are presented. Asymmetric electrochromic devices have been constructed based on these porous WO3 thin films. XRD measurements of the intercalation/deintercalation of Li+ into/from the WO3 layer of the device as a function of applied coloration/bleaching voltages show systematic changes in the lattice parameters associated with structural phase transitions in LixWO3. Micro-Raman studies show systematic crystalline phase changes in the spectra of WO3 layers during Li+ ion intercalation and deintercalation, which agree with the XRD data. These devices exhibit interesting optical modulation (up to ~70% due to intercalation/deintercalation of Li ions into/from the WO3 layer of the devices as a function of applied coloration/bleaching voltages. The obtained optical modulation of the electrochromic devices indicates that, they are suitable for applications in electrochromic smart windows.

  16. Oxidation Effect in Octahedral Hafnium Disulfide Thin Film.

    Science.gov (United States)

    Chae, Sang Hoon; Jin, Youngjo; Kim, Tae Soo; Chung, Dong Seob; Na, Hyunyeong; Nam, Honggi; Kim, Hyun; Perello, David J; Jeong, Hye Yun; Ly, Thuc Hue; Lee, Young Hee

    2016-01-26

    Atomically smooth van der Waals materials are structurally stable in a monolayer and a few layers but are susceptible to oxygen-rich environments. In particular, recently emerging materials such as black phosphorus and perovskite have revealed stronger environmental sensitivity than other two-dimensional layered materials, often obscuring the interesting intrinsic electronic and optical properties. Unleashing the true potential of these materials requires oxidation-free sample preparation that protects thin flakes from air exposure. Here, we fabricated few-layer hafnium disulfide (HfS2) field effect transistors (FETs) using an integrated vacuum cluster system and study their electronic properties and stability under ambient conditions. By performing all the device fabrication and characterization procedure under an oxygen- and moisture-free environment, we found that few-layer AA-stacking HfS2-FETs display excellent field effect responses (Ion/Ioff ≈ 10(7)) with reduced hysteresis compared to the FETs prepared under ambient conditions. Oxidation of HfS2 occurs uniformly over the entire area, increasing the film thickness by 250% at a prolonged oxidation time of >120 h, while defects on the surface are the preferential initial oxidation sites. We further demonstrated that the stability of the device in air is significantly improved by passivating FETs with BN in a vacuum cluster.

  17. Strain-induced phenomenon in complex oxide thin films

    Science.gov (United States)

    Haislmaier, Ryan

    Complex oxide materials wield an immense spectrum of functional properties such as ferroelectricity, ferromagnetism, magnetoelectricity, optoelectricity, optomechanical, magnetoresistance, superconductivity, etc. The rich coupling between charge, spin, strain, and orbital degrees of freedom makes this material class extremely desirable and relevant for next generation electronic devices and technologies which are trending towards nanoscale dimensions. Development of complex oxide thin film materials is essential for realizing their integration into nanoscale electronic devices, where theoretically predicted multifunctional capabilities of oxides could add tremendous value. Employing thin film growth strategies such as epitaxial strain and heterostructure interface engineering can greatly enhance and even unlock novel material properties in complex oxides, which will be the main focus of this work. However, physically incorporating oxide materials into devices remains a challenge. While advancements in molecular beam epitaxy (MBE) of thin film oxide materials has led to the ability to grow oxide materials with atomic layer precision, there are still major limitations such as controlling stoichiometric compositions during growth as well as creating abrupt interfaces in multi-component layered oxide structures. The work done in this thesis addresses ways to overcome these limitations in order to harness intrinsic material phenomena. The development of adsorption-controlled stoichiometric growth windows of CaTiO3 and SrTiO3 thin film materials grown by hybrid MBE where Ti is supplied using metal-organic titanium tetraisopropoxide material is thoroughly outlined. These growth windows enable superior epitaxial strain-induced ferroelectric and dielectric properties to be accessed as demonstrated by chemical, structural, electrical, and optical characterization techniques. For tensile strained CaTiO3 and compressive strained SrTiO 3 films, the critical effects of

  18. Physical investigation of electrophoretically deposited graphene oxide and reduced graphene oxide thin films

    Science.gov (United States)

    Politano, Grazia Giuseppina; Versace, Carlo; Vena, Carlo; Castriota, Marco; Ciuchi, Federica; Fasanella, Angela; Desiderio, Giovanni; Cazzanelli, Enzo

    2016-11-01

    Graphene oxide and reduced graphene oxide thin films are very promising materials because they can be used in optoelectronic devices and in a growing range of applications such as touch screens and flexible displays. In this work, graphene oxide (GO) and thermally reduced graphene oxide (rGO) thin films, deposited on Ti/glass substrates, have been obtained by electrophoretic deposition. The morphological and the structural properties of the samples have been investigated by micro-Raman technique, X-ray reflectometry, and SEM analysis. In order to study the optical and electrical properties, variable angle spectroscopic ellipsometry and impedance analysis have been performed. The thermal annealing changes strongly the structural, electrical, and optical properties, because during the thermal processes some amount of sp3 bonds originally present in GO were removed. In particular, the annealing enhances the Ohmic behavior of the rGO film increasing its conductivity and the estimated optical density. Moreover, using electrophoretic deposition, we have found a higher value of optical density for GO thin films, not observed in GO films obtained with other deposition methods.

  19. Flexible Electronics Powered by Mixed Metal Oxide Thin Film Transistors

    Science.gov (United States)

    Marrs, Michael

    A low temperature amorphous oxide thin film transistor (TFT) and amorphous silicon PIN diode backplane technology for large area flexible digital x-ray detectors has been developed to create 7.9-in. diagonal backplanes. The critical steps in the evolution of the backplane process include the qualification and optimization of the low temperature (200 °C) metal oxide TFT and a-Si PIN photodiode process, the stability of the devices under forward and reverse bias stress, the transfer of the process to flexible plastic substrates, and the fabrication and assembly of the flexible detectors. Mixed oxide semiconductor TFTs on flexible plastic substrates suffer from performance and stability issues related to the maximum processing temperature limitation of the polymer. A novel device architecture based upon a dual active layer improves both the performance and stability. Devices are directly fabricated below 200 ºC on a polyethylene naphthalate (PEN) substrate using mixed metal oxides of either zinc indium oxide (ZIO) or indium gallium zinc oxide (IGZO) as the active semiconductor. The dual active layer architecture allows for adjustment to the saturation mobility and threshold voltage stability without the requirement of high temperature annealing, which is not compatible with flexible plastic substrates like PEN. The device performance and stability is strongly dependent upon the composition of the mixed metal oxide; this dependency provides a simple route to improving the threshold voltage stability and drive performance. By switching from a single to a dual active layer, the saturation mobility increases from 1.2 cm2/V-s to 18.0 cm2/V-s, while the rate of the threshold voltage shift decreases by an order of magnitude. This approach could assist in enabling the production of devices on flexible substrates using amorphous oxide semiconductors. Low temperature (200°C) processed amorphous silicon photodiodes were developed successfully by balancing the tradeoffs

  20. Tungsten oxide thin films: detection and trapping of hazardous gases

    Science.gov (United States)

    Godbole, Rhushikesh; Vedpathak, Amol; Godbole, Vijay; Bhagwat, Sunita

    2017-07-01

    Synthesis of tungsten (W) and tungsten tri-oxide (WO3) thin films on alumina substrate by a peculiar Red-ox reaction route using hot-filament chemical vapor deposition technique is described. The resulting tungsten and tungsten oxide films were characterized using various techniques such as x-ray diffraction (XRD), Raman spectroscopy and Scanning electron microscopy (SEM). XRD results revealed the complete conversion of cubic phase of pure tungsten into monoclinic phase of tungsten oxide. Raman spectroscopic analysis also confirmed the formation of WO3. SEM images show considerable alteration in morphology from well faceted particles to wafers when pure W-film was converted to WO3 film. The wafer like morphology of WO3 films is found to be suitable for gas sensing towards hazardous gases such as NO2 and NH3. The WO3 films showcased their highly responsive nature towards NO2 gas with exceptionally high gas sensitivity ~32. WO3 film demonstrated longer recovery time towards NO2 gas unlike NH3 gas making them attractive for their utilization in ‘Newer application’ such as a catalyst support material in catalytic converter devices which are potential representatives to arrest pollutant gases (NO2) getting flown into the living environment.

  1. Sputter-deposited low reflectance vanadium oxide-molybdenum oxide thin films on silicon

    Science.gov (United States)

    Nayak, Manish Kumar; Esther, A. Carmel Mary; Bera, Parthasarathi; Dey, Arjun

    2017-09-01

    A single layer antireflective, smart, crystalline and nanocolumnar pulsed RF magnetron sputtered vanadium oxide-molybdenum oxide thin film on silicon is proposed for the alternate antireflective material for silicon based futuristic solar cell application. The VO-MO film with 130 nm thickness grown at 200 W shows significant low reflectance (1% within the 500-600 nm region). The VO-MO film with lowest reflectance shows a phase transition at around 55 °C which is beneficial due to film inherent variable IR emittance behaviour which may be helpful for eliminating excess heat load generated during in-service of silicon solar cell.

  2. Metal oxide semiconductor thin-film transistors for flexible electronics

    Energy Technology Data Exchange (ETDEWEB)

    Petti, Luisa; Vogt, Christian; Büthe, Lars; Cantarella, Giuseppe; Tröster, Gerhard [Electronics Laboratory, Swiss Federal Institute of Technology, Zürich (Switzerland); Münzenrieder, Niko [Electronics Laboratory, Swiss Federal Institute of Technology, Zürich (Switzerland); Sensor Technology Research Centre, University of Sussex, Falmer (United Kingdom); Faber, Hendrik; Bottacchi, Francesca; Anthopoulos, Thomas D. [Department of Physics and Centre for Plastic Electronics, Imperial College London, London (United Kingdom)

    2016-06-15

    The field of flexible electronics has rapidly expanded over the last decades, pioneering novel applications, such as wearable and textile integrated devices, seamless and embedded patch-like systems, soft electronic skins, as well as imperceptible and transient implants. The possibility to revolutionize our daily life with such disruptive appliances has fueled the quest for electronic devices which yield good electrical and mechanical performance and are at the same time light-weight, transparent, conformable, stretchable, and even biodegradable. Flexible metal oxide semiconductor thin-film transistors (TFTs) can fulfill all these requirements and are therefore considered the most promising technology for tomorrow's electronics. This review reflects the establishment of flexible metal oxide semiconductor TFTs, from the development of single devices, large-area circuits, up to entirely integrated systems. First, an introduction on metal oxide semiconductor TFTs is given, where the history of the field is revisited, the TFT configurations and operating principles are presented, and the main issues and technological challenges faced in the area are analyzed. Then, the recent advances achieved for flexible n-type metal oxide semiconductor TFTs manufactured by physical vapor deposition methods and solution-processing techniques are summarized. In particular, the ability of flexible metal oxide semiconductor TFTs to combine low temperature fabrication, high carrier mobility, large frequency operation, extreme mechanical bendability, together with transparency, conformability, stretchability, and water dissolubility is shown. Afterward, a detailed analysis of the most promising metal oxide semiconducting materials developed to realize the state-of-the-art flexible p-type TFTs is given. Next, the recent progresses obtained for flexible metal oxide semiconductor-based electronic circuits, realized with both unipolar and complementary technology, are reported. In

  3. An amorphous oxide semiconductor thin-film transistor route to oxide electronics

    OpenAIRE

    Wager, John F.; Yeh, Bao; Hoffman, Randy L.; Keszler, Douglas A.

    2014-01-01

    Amorphous oxide semiconductor (AOS) thin-film transistors (TFTs) invented only one decade ago are now being commercialized for active-matrix liquid crystal display (AMLCD) backplane applications. They also appear to be well positioned for other flat-panel display applications such as active-matrix organic light-emitting diode (AMOLED) applications, electrophoretic displays, and transparent displays. The objectives of this contribution are to overview AOS materials design; assess indium galliu...

  4. Conductivity and thermoelectric properties of nanostructure tin oxide thin films

    Directory of Open Access Journals (Sweden)

    M.A. Batal

    2014-04-01

    Full Text Available Tin oxide thin films doped with iron or copper were deposited on glass and porous alumina substrates, using the co-deposition dip coating sol–gel technique. Alumina substrate was prepared by the anodizing technique. Samples were sintered for 2 h at temperature 600 °C. The XRD spectrum of deposited samples shows a polycrystalline structure with a clear characteristic peak of SnO2 cassiterite phase. From (I–V characteristics measured at different temperatures for samples prepared on glass substrates, the density of states at the Fermi level was calculated. Thermoelectric effect was measured with a change of temperature for prepared samples under low pressure 1 mbar. Seebeck coefficient, the carrier concentration, the charge carrier mobility and the figure merit were determined for prepared samples under low pressure 1 mbar. Seebeck coefficient was improved when films were deposited on porous Alumina substrates.

  5. Optoelectrical and structural properties of evaporated indium oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Naseem, S. (Centre for Solid State Physics, Univ. of the Punjab, Lahore (Pakistan)); Iqbal, M. (Centre for Solid State Physics, Univ. of the Punjab, Lahore (Pakistan)); Hussain, K. (Centre for Solid State Physics, Univ. of the Punjab, Lahore (Pakistan))

    1993-11-01

    Indium oxide thin films have been prepared by evaporating indium metal in the presence of oxygen atmosphere. The oxygen partial pressure was kept at a fixed value, of 1 mTorr, previously found to be optimum for the present investigations. The substrate temperature was varied from room temperature to 300 C. Once an optimum substrate temperature of 250 C was established, more films were prepared at this temperature and these films were then given a post-deposition heat treatment in nitrogen and oxygen atmospheres. The resultant films were characterized for their optical, electrical and structural properties. The results show that films with a resistivity as low as 3.38x10[sup -4] [Omega] cm, and with a transmittance as high as 91% can be achieved by controlling the preparation conditions. (orig.)

  6. Chemical Strain Engineering of Magnetism in Oxide Thin Films.

    Science.gov (United States)

    Copie, Olivier; Varignon, Julien; Rotella, Hélène; Steciuk, Gwladys; Boullay, Philippe; Pautrat, Alain; David, Adrian; Mercey, Bernard; Ghosez, Philippe; Prellier, Wilfrid

    2017-06-01

    Transition metal oxides having a perovskite structure form a wide and technologically important class of compounds. In these systems, ferroelectric, ferromagnetic, ferroelastic, or even orbital and charge orderings can develop and eventually coexist. These orderings can be tuned by external electric, magnetic, or stress field, and the cross-couplings between them enable important multifunctional properties, such as piezoelectricity, magneto-electricity, or magneto-elasticity. Recently, it has been proposed that additional to typical fields, the chemical potential that controls the concentration of ion vacancies in these systems may reveal an efficient alternative parameter to further tune their properties and achieve new functionalities. In this study, concretizing this proposal, the authors show that the control of the content of oxygen vacancies in perovskite thin films can indeed be used to tune their magnetic properties. Growing PrVO 3 thin films epitaxially on an SrTiO 3 substrate, the authors reveal a concrete pathway to achieve this effect. The authors demonstrate that monitoring the concentration of oxygen vacancies through the oxygen partial pressure or the growth temperature can produce a substantial macroscopic tensile strain of a few percent. In turn, this strain affects the exchange interactions, producing a nontrivial evolution of Néel temperature in a range of 30 K. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  7. Spray Pyrolyzed Polycrystalline Tin Oxide Thin Film as Hydrogen Sensor

    Directory of Open Access Journals (Sweden)

    Ganesh E. Patil

    2010-09-01

    Full Text Available Polycrystalline tin oxide (SnO2 thin film was prepared by using simple and inexpensive spray pyrolysis technique (SPT. The film was characterized for their phase and morphology by X-ray diffraction (XRD and scanning electron microscopy (SEM, respectively. The crystallite size calculated from the XRD pattern is 84 nm. Conductance responses of the polycrystalline SnO2 were measured towards gases like hydrogen (H2, liquefied petroleum gas (LPG, ethanol vapors (C2H5OH, NH3, CO, CO2, Cl2 and O2. The gas sensing characteristics were obtained by measuring the sensor response as a function of various controlling factors like operating temperature, operating voltages (1 V, 5 V, 10 V 15 V, 20 V and 25 V and concentration of gases. The sensor response measurement showed that the SnO2 has maximum response to hydrogen. Furthermore; the SnO2 based sensor exhibited fast response and good recovery towards hydrogen at temperature 150 oC. The result of response towards H2 reveals that SnO2 thin film prepared by SPT would be a suitable material for the fabrication of the hydrogen sensor.

  8. Sputtered boron indium oxide thin-film transistors

    Science.gov (United States)

    Stewart, Kevin A.; Gouliouk, Vasily; Keszler, Douglas A.; Wager, John F.

    2017-11-01

    Boron indium oxide (BIO) is studied for thin-film transistor (TFT) channel layer applications. Sputtered BIO thin films exhibit an amorphous phase over a wide range of B2O3/In2O3 ratios and remain amorphous up to 500 °C. The band gap decreases linearly with decreasing boron content, whereas device performance generally improves with decreasing boron content. The best amorphous BIO TFT exhibits a field-effect mobility of 10 cm2 V-1 s-1, turn-on voltage of 2.5 V, and sub-threshold swing of 0.72 V/dec. Decreasing the boron content to 12.5% leads to a polycrystalline phase, but further increases the mobility up to 20-40 cm2 V-1 s-1. TCAD simulation results suggest that the reason for higher performance after increasing the anneal temperature from 200 to 400 °C is due to a lower defect density in the sub-bandgap region of the BIO channel layer.

  9. Amperometric detection and electrochemical oxidation of aliphatic amines and ammonia on silver-lead oxide thin-film electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Ge, Jisheng [Iowa State Univ., Ames, IA (United States)

    1996-01-08

    This thesis comprises three parts: Electrocatalysis of anodic oxygen-transfer reactions: aliphatic amines at mixed Ag-Pb oxide thin-film electrodes; oxidation of ammonia at anodized Ag-Pb eutectic alloy electrodes; and temperature effects on oxidation of ethylamine, alanine, and aquated ammonia.

  10. Island shapes in homoepitaxial growth of Pt(111)

    DEFF Research Database (Denmark)

    Jacobsen, Joachim; Jacobsen, Karsten Wedel; Nørskov, Jens Kehlet

    1996-01-01

    We present a kinetic model for the homoepitaxial growth of Pt(111) capable of reproducing the experimentally observed compact island shapes in a set of kinetic Monte-Carlo simulations. We propose that an anomaly in the binding of single atoms to the two types of close packed steps causes the appe......We present a kinetic model for the homoepitaxial growth of Pt(111) capable of reproducing the experimentally observed compact island shapes in a set of kinetic Monte-Carlo simulations. We propose that an anomaly in the binding of single atoms to the two types of close packed steps causes...... the appearance of triangular islands around 400 K. The anomaly is that the single atoms bind the strongest to the more stable close packed step. We argue, that this cannot be the cage for longer rows of atoms attached to the steps, and assuming that dimers bind the strongest to the less stable close packed step......, we show this causes the appearance of triangular islands of the opposite orientation around 650 K....

  11. HREM investigation of the constitution and the crystallography of thin thermal oxide layers on iron

    DEFF Research Database (Denmark)

    Graat, P.C.J.; Brongers, M.P.H.; Zandbergen, H.W.

    1997-01-01

    /ferrite and a Shoji-Nishiyama-type orientation relationship for hematite/magnetite were observed. At several locations cracks close to and parallel to the interface with the substrate were observed within Fe3O4. Oxidation of iron samples that were covered with an (hydro)oxide film prior to oxidation yielded thin...

  12. Laser-Scribed Photo-thermal Reduction of Graphene-Oxide for Thin Film Sensor Applications

    OpenAIRE

    Kazemzadeh, Rouzbeh

    2015-01-01

    In this thesis, a cost effective, simple and fast method of reduction of Graphene Oxide thin film is proposed. Graphene oxide is a non-conductive material intrinsically and one of the techniques to convert it to conductive material is using laser beam to remove oxygen groups from its surface, in other words, to reduce it. Laser parameters must be optimized for an effective and successful reduction. Thin film of non-conductive Graphene oxide is converted into conductive thin layer by fast lase...

  13. Charge transport in nanoparticular thin films of zinc oxide and aluminum-doped zinc oxide

    OpenAIRE

    Lenz, Thomas; Richter, Moses; Matt, Gebhard J.; Luechinger, Norman A.; Halim, Samuel C.; Heiss, Wolfgang; Brabec, Christoph J.

    2015-01-01

    In this work, we report on the electrical characterization of nanoparticular thin films of zinc oxide (ZnO) and aluminum-doped ZnO (AZO). Temperature-dependent current–voltage measurements revealed that charge transport for both, ZnO and AZO, is well described by the Poole–Frenkel model and excellent agreement between the experimental data and the theoretical predictions is demonstrated. For the first time it is shown that the nature of the charge-transport is not affected by the doping of th...

  14. Sn-doped Zinc Oxide thin films for LPG sensors

    Directory of Open Access Journals (Sweden)

    R. K. Nath

    2012-03-01

    Full Text Available Sn doped zinc oxide (ZnO:Sn thin films have been prepared by chemical spray pyrolysis technique using Zn(CH3COO2 as a precursor solution and SnCl4 as a doping solution respectively. The dopant concentration (Sn/Zn at% is varied from 0 to 1.5 at%. The structural, morphological, optical and electrical properties of the films are explored and then tested for LPG sensing. The resistivity of the Sn-doped films decreases with the Sn doping up to 0.5at%, while at a higher doping concentration the disorder produced in the lattice causes an increase in resistivity of the films. Exposure of LPG decreases the resistance of undoped and doped films. The response of the film is measured for both ZnO and ZnO:Sn films at different operating temperature (275-400℃ and concentration (vol % of LPG in air. It is observed that Sn-doped ZnO films are more sensitive to LPG than undoped ZnO film. In this work, maximum response (~88 % is observed for 0.5at % ZnO:Sn film for 1 vol% of LPG in air at 300℃. Further all the films have shown faster response and recovery times at higher operating temperatures

  15. Sn-doped Zinc Oxide Thin Films for Methanol

    Directory of Open Access Journals (Sweden)

    Rajarshi Krishna NATH

    2009-09-01

    Full Text Available Sn doped zinc oxide (ZnO:Sn thin films have been prepared by chemical spray pyrolysis technique with dopant concentration (Sn/Zn at % from 0 to 1.5 at %. The structural, morphological, optical and electrical properties of the films are explored and then tested for methanol sensing. The resistivity of the films decreases with Sn doping up to 0.5 at %, while at higher doping concentration the disorder produced in the lattice causes an increase in resistivity of the films. Exposure of methanol decreases the resistance of the films. The response of the film is measured for both ZnO and ZnO:Sn films at different operating temperature (200-350 0C and concentration (ppm of methanol in air. It is observed that ZnO:Sn films are more sensitive to methanol than undoped ZnO film. The maximum response (~53 % is observed for 0.5at % ZnO:Sn film to 500 ppm of methanol in air at 300 0C. Further the films have shown faster response and recovery times at higher operating temperatures.

  16. Albumin adsorption on oxide thin films studied by spectroscopic ellipsometry

    Energy Technology Data Exchange (ETDEWEB)

    Silva-Bermudez, P., E-mail: suriel21@yahoo.com [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito Exterior s/n, C.U., 04510, Mexico D.F. (Mexico); Unidad de Posgrado, Facultad de Odontologia, Universidad Nacional Autonoma de Mexico, CU, 04510, Mexico D.F. (Mexico); Rodil, S.E.; Muhl, S. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito Exterior s/n, C.U., 04510, Mexico D.F. (Mexico)

    2011-12-15

    Thin films of tantalum, niobium, zirconium and titanium oxides were deposited by reactive magnetron sputtering and their wettability and surface energy, optical properties, roughness, chemical composition and microstructure were characterized using contact angle measurements, spectroscopic ellipsometry, profilometry, X-ray photoelectron spectroscopy and X-ray diffraction, respectively. The purpose of the work was to correlate the surface properties of the films to the Bovine Serum Albumin (BSA) adsorption, as a first step into the development of an initial in vitro test of the films biocompatibility, based on standardized protein adsorption essays. The films were immersed into BSA solutions with different protein concentrations and protein adsorption was monitored in situ by dynamic ellipsometry; the adsorption-rate was dependent on the solution concentration and the immersion time. The overall BSA adsorption was studied in situ using spectroscopic ellipsometry and it was found to be influenced by the wettability of the films; larger BSA adsorption occurred on the more hydrophobic surface, the ZrO{sub 2} film. On the Ta{sub 2}O{sub 5}, Nb{sub 2}O{sub 5} and TiO{sub 2} films, hydrophilic surfaces, the overall BSA adsorption increased with the surface roughness or the polar component of the surface energy.

  17. Organic thin film transistors with indium tin oxide bottom electrode

    Energy Technology Data Exchange (ETDEWEB)

    Han, Chang-Wook [School of Electrical Engineering 50, Seoul National University, Shinlim-dong, Gwanak-gu, Seoul 151-742 (Korea, Republic of); Shin, Hee-Sun [School of Electrical Engineering 50, Seoul National University, Shinlim-dong, Gwanak-gu, Seoul 151-742 (Korea, Republic of); Park, Joong-Hyun [School of Electrical Engineering 50, Seoul National University, Shinlim-dong, Gwanak-gu, Seoul 151-742 (Korea, Republic of); Han, Min-Koo [School of Electrical Engineering 50, Seoul National University, Shinlim-dong, Gwanak-gu, Seoul 151-742 (Korea, Republic of); Pang, Hee-Suk [LG.PHILIPS LCD R and D Center 533 Anyang-shi, Gyongki-do 431-080 (Korea, Republic of); Kim, Ki-Yong [LG.PHILIPS LCD R and D Center 533 Anyang-shi, Gyongki-do 431-080 (Korea, Republic of); Chung, In-Jae [LG.PHILIPS LCD R and D Center 533 Anyang-shi, Gyongki-do 431-080 (Korea, Republic of); Pyo, Sang-Woo [Department of Electrical Information and Control Engineering, Hongik University (Korea, Republic of); Lee, Dong-Hyun [Department of Information Display Engineering, Hongik University (Korea, Republic of); Kim, Young-Kwan [Department of Information Display Engineering, Hongik University (Korea, Republic of)

    2006-09-01

    Organic thin film transistors (OTFTs) which employ indium tin oxide (ITO) as source and drain electrodes instead of gold are fabricated. A double gate dielectric layer was used, which consists of benzocyclobutane (BCB) and silicon nitride (SiN{sub x}). The pentacene TFT has lateral dimensions 192 {mu}mx6 {mu}m. The OTFT with the ITO bottom electrode shows a saturation mobility of 0.05{approx}0.09 cm{sup 2} V{sup -1} s{sup -1} and an on-off current ratio of the order of 10{sup 5} in a gate voltage span between 0 and -40 V. The TFT fabrication process steps had the beneficial side effect of changing the ITO surface from hydrophilic to hydrophobic. This change allows pentacene films with larger grains, observed up to 0.5 {mu}m, to be grown on TFT compared to as-deposited ITO film onto which high quality films cannot be grown.

  18. P-channel thin film transistors using reduced graphene oxide

    Science.gov (United States)

    Chakraborty, S.; Resmi, A. N.; Renuka Devi, P.; Jinesh, K. B.

    2017-04-01

    Chemically reduced graphene oxide (rGO) samples with various degrees of reduction were prepared using hydrazine hydrate as the reducing agent. Scanning tunnelling microscope imaging shows that rGO contains rows of randomly distributed patches of epoxy groups. The local density of states of the rGO samples were mapped with scanning tunnelling spectroscopy, which shows that the bandgap in rGO originates from the epoxide regions itself. The Fermi level of the epoxide regions is shifted towards the valence band, making rGO locally p-type and a range of bandgaps from 0-2.2 eV was observed in these regions. Thin film transistors were fabricated using rGO as the channel layer. The devices show excellent output characteristics with clear saturation and gate dependence. The transfer characteristics show that rGO behaves as a p-type semiconductor; the devices exhibit an on/off ratio of 104, with a low-bias hole mobility of 3.9 cm2 V-1 s-1.

  19. Transparent, flexible, all-reduced graphene oxide thin film transistors.

    Science.gov (United States)

    He, Qiyuan; Wu, Shixin; Gao, Shuang; Cao, Xiehong; Yin, Zongyou; Li, Hai; Chen, Peng; Zhang, Hua

    2011-06-28

    Owing to their unique thickness-dependent electronic properties, together with perfect flexibility and transparency, graphene and its relatives make fantastic material for use in both active channel and electrodes in various electronic devices. On the other hand, the electronic sensors based on graphene show high potential in detection of both chemical and biological species with high sensitivity. In this contribution, we report the fabrication of all-reduced graphene oxide (rGO) thin film transistors by a combination of solution-processed rGO electrodes with a micropatterned rGO channel, and then study their applications in biosensing. Our all-rGO devices are cost-effective, highly reproducible, and reliable. The fabricated electronic sensor is perfectly flexible with high transparency, showing good sensitivity in detecting proteins in the physiological buffer. As a proof of concept, fibronectin as low as 0.5 nM was successfully detected, which is comparable with the previously reported protein sensors based on single-layer pristine graphene obtained from mechanical cleavage. The specific detection of avidin by using biotinylated all-rGO sensor is also successfully demonstrated.

  20. Sputtered tin oxide and titanium oxide thin films as alternative transparent conductive oxides

    Energy Technology Data Exchange (ETDEWEB)

    Boltz, Janika

    2011-12-12

    Alternative transparent conductive oxides to tin doped indium oxide have been investigated. In this work, antimony doped tin oxide and niobium doped titanium oxide have been studied with the aim to prepare transparent and conductive films. Antimony doped tin oxide and niobium doped titanium oxide belong to different groups of oxides; tin oxide is a soft oxide, while titanium oxide is a hard oxide. Both oxides are isolating materials, in case the stoichiometry is SnO{sub 2} and TiO{sub 2}. In order to achieve transparent and conductive films free carriers have to be generated by oxygen vacancies, by metal ions at interstitial positions in the crystal lattice or by cation doping with Sb or Nb, respectively. Antimony doped tin oxide and niobium doped titanium oxide films have been prepared by reactive direct current magnetron sputtering (dc MS) from metallic targets. The process parameters and the doping concentration in the films have been varied. The films have been electrically, optically and structurally analysed in order to analyse the influence of the process parameters and the doping concentration on the film properties. Post-deposition treatments of the films have been performed in order to improve the film properties. For the deposition of transparent and conductive tin oxide, the dominant parameter during the deposition is the oxygen content in the sputtering gas. The Sb incorporation as doping atoms has a minor influence on the electrical, optical and structural properties. Within a narrow oxygen content in the sputtering gas highly transparent and conductive tin oxide films have been prepared. In this study, the lowest resistivity in the as deposited state is 2.9 m{omega} cm for undoped tin oxide without any postdeposition treatment. The minimum resistivity is related to a transition to crystalline films with the stoichiometry of SnO{sub 2}. At higher oxygen content the films turn out to have a higher resistivity due to an oxygen excess. After post

  1. Thin film bismuth iron oxides useful for piezoelectric devices

    Science.gov (United States)

    Zeches, Robert J.; Martin, Lane W.; Ramesh, Ramamoorthy

    2016-05-31

    The present invention provides for a composition comprising a thin film of BiFeO.sub.3 having a thickness ranging from 20 nm to 300 nm, a first electrode in contact with the BiFeO.sub.3 thin film, and a second electrode in contact with the BiFeO.sub.3 thin film; wherein the first and second electrodes are in electrical communication. The composition is free or essentially free of lead (Pb). The BFO thin film is has the piezoelectric property of changing its volume and/or shape when an electric field is applied to the BFO thin film.

  2. Investigation of the Carbon Monoxide Gas Sensing Characteristics of Tin Oxide Mixed Cerium Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    Muhammad B. Haider

    2012-02-01

    Full Text Available Thin films of tin oxide mixed cerium oxide were grown on unheated substrates by physical vapor deposition. The films were annealed in air at 500 °C for two hours, and were characterized using X-ray photoelectron spectroscopy, atomic force microscopy and optical spectrophotometry. X-ray photoelectron spectroscopy and atomic force microscopy results reveal that the films were highly porous and porosity of our films was found to be in the range of 11.6–21.7%. The films were investigated for the detection of carbon monoxide, and were found to be highly sensitive. We found that 430 °C was the optimum operating temperature for sensing CO gas at concentrations as low as 5 ppm. Our sensors exhibited fast response and recovery times of 26 s and 30 s, respectively.

  3. Hybrid dextran-iron oxide thin films deposited by laser techniques for biomedical applications

    Energy Technology Data Exchange (ETDEWEB)

    Predoi, D.; Ciobanu, C.S. [National Institute for Physics of Materials, P.O. Box MG 07, Bucharest, Magurele (Romania); Radu, M.; Costache, M.; Dinischiotu, A. [Molecular Biology Center, University of Bucharest, 91-95 Splaiul Independentei, 76201, Bucharest 5 (Romania); Popescu, C.; Axente, E.; Mihailescu, I.N. [National Institute for Lasers, Plasma and Radiations Physics, P. O. Box MG 36, 77125 Bucharest (Romania); Gyorgy, E., E-mail: egyorgy@cin2.es [National Institute for Lasers, Plasma and Radiations Physics, P. O. Box MG 36, 77125 Bucharest (Romania); Consejo Superior de Investigaciones Cientificas, Centre d' Investigacions en Nanociencia i Nanotecnologia (CSIC-CIN2), Campus UAB, 08193 Bellaterra (Spain)

    2012-02-01

    Iron oxide nanoparticles were prepared by chemical co-precipitation method. The nanoparticles were mixed with dextran in distilled water. The obtained solutions were frozen in liquid nitrogen and used as targets during matrix assisted pulsed laser evaporation for the growth of hybrid, iron oxide nanoparticles-dextran thin films. Fourier Transform Infrared Spectroscopy and X-ray diffraction investigations revealed that the obtained films preserve the structure and composition of the initial, non-irradiated iron oxide-dextran composite material. The biocompatibility of the iron oxide-dextran thin films was demonstrated by 3-(4.5 dimethylthiazol-2yl)-2.5-diphenyltetrazolium bromide-based colorimetric assay, using human liver hepatocellular carcinoma cells. - Highlights: Black-Right-Pointing-Pointer Hybrid, dextran-iron oxide nanoparticles and thin films. Black-Right-Pointing-Pointer Laser immobilization. Black-Right-Pointing-Pointer Biocompatibility of dextran-iron oxide nanoparticles.

  4. Indium oxide thin film based ammonia gas and ethanol vapour sensor

    Indian Academy of Sciences (India)

    Unknown

    perature corning glass substrate by flash evaporation method. Gold was deposited on the film using thermal .... Two thin film gold electrodes were also depo-. Table 1. Parameters for fabrication of indium oxide thin .... periodic heating mode of operation, both response and recovery times are long (8–10%) (Patel et al 1994).

  5. Localized tail state distribution and hopping transport in ultrathin zinc-tin-oxide thin film transistor

    NARCIS (Netherlands)

    Li, Jeng-Ting; Liu, Li-Chih; Chen, Jen-Sue; Jeng, Jiann-Shing; Liao, Po-Yung; Chiang, Hsiao-Cheng; Chang, Ting-Chang; Nugraha, Mohamad Insan; Loi, Maria Antonietta

    2017-01-01

    Carrier transport properties of solution processed ultra thin (4 nm) zinc-tin oxide (ZTO) thin film transistor are investigated based on its transfer characteristics measured at the temperature ranging from 310K to 77K. As temperature decreases, the transfer curves show a parellel shift toward more

  6. Electrical characterization of graphene oxide and organic dielectric layers based on thin film transistor

    Energy Technology Data Exchange (ETDEWEB)

    Karteri, İbrahim, E-mail: ibrahimkarteri@gmail.com [Department of Materials Science And Engineering, Kahramanmaras Sutcu Imam University, Kahramanmaraş 4610 (Turkey); Karataş, Şükrü [Department of Physics, Kahramanmaras Sutcu Imam University, Kahramanmaraş 4610 (Turkey); Yakuphanoğlu, Fahrettin [Department of Physics, Fırat University, Elazıg 2310 (Turkey)

    2014-11-01

    Highlights: • We report the synthesis of graphene oxide nanosheets and electrical characterization of graphene oxide based thin film transistor. • Graphene oxide (GO) nanosheets were prepared by using modified Hummers method. • We used insulator layers which are polymethylmethacrylate (PMMA) and polyvinyl phenol (PVP) for graphene oxide based thin flim transistor. - Abstract: We have studied the electrical characteristics of graphene oxide based thin flim transistor with the polymer insulators such as polymethyl methacrylate (PMMA) and poly-4-vinylphenol (PVP). Graphene oxide (GO) nanosheets were prepared by using modified Hummers method. The structural properties of GO nanosheets were characterized with Ultraviolet Visible (UV–vis), FT-IR spectroscopy and X-rays diffraction (XRD). Graphene oxide based thin flim transistor (GO-TFT) was prepared by a spin-coating and thermal evaporation technique. The electrical characterization of GO-TFT was analyzed by output and transfer characteristics by using Keithley-4200 semiconductor characterization system (SCS). The graphene oxide based thin flim transistor devices show p-type semiconducting behavior. The mobility, threshold voltage, sub-threshold swing value and I{sub on}/I{sub off} of GO-TFT were found to be 0.105 cm{sup 2} V{sup −1} s{sup −1}, −8.7 V, 4.03 V/decade and 10, respectively.

  7. Uniformity of gallium doped zinc oxide thin film prepared by pulsed laser deposition

    OpenAIRE

    Mitsugi, Fumiaki; Umeda, Yoshihiro; Sakai, Norihiro; Ikegami, Tomoaki; ミツギ, フミアキ; ウメダ, ヨシヒロ; サカイ, ノリヒロ; イケガミ, トモアキ; 光木, 文秋; 梅田, 佳宏; 坂井, 徳浩; 池上, 知顯

    2010-01-01

    Recently, transparent conducting oxide thin films have attracted attention for the application to transparent conducting electrodes. In this work, we evaluated the uniformity of electrical, optical and structural properties for gallium doped zinc oxide thin films prepared on the 10 × 10 cm2 silica glass substrate by pulsed laser deposition. The resistivity, carrier concentration, mobility, bonding state and atomic composition of the film were uniform along in-plane and depth direction over th...

  8. Hall hole mobility in boron-doped homoepitaxial diamond

    Science.gov (United States)

    Pernot, J.; Volpe, P. N.; Omnès, F.; Muret, P.; Mortet, V.; Haenen, K.; Teraji, T.

    2010-05-01

    Hall hole mobility of boron-doped homoepitaxial (100) diamond samples has been investigated in the temperature range of 100-900 K, both experimentally and theoretically. The temperature dependence of the mobility measured in high-quality and low boron-doped materials was compared with theoretical calculations to determine the phonon-hole coupling constants (deformation potential for acoustic phonons and coupling constant for optical phonons). The maximum hole mobility is found to be close to 2000cm2/Vs at room temperature. For boron-doped material, the hole scattering by neutral boron atoms is shown to be important in diamond due to the high ionization energy of the boron acceptor. The doping dependence of the Hall hole mobility is established for boron-doping levels ranging between 1014 and 1020cm-3 at 300 and 500 K. The physical reasons which make diamond a semiconductor with a higher mobility than other semiconductors of column IV are discussed.

  9. Nano-oxide thin films deposited via atomic layer deposition on microchannel plates.

    Science.gov (United States)

    Yan, Baojun; Liu, Shulin; Heng, Yuekun

    2015-01-01

    Microchannel plate (MCP) as a key part is a kind of electron multiplied device applied in many scientific fields. Oxide thin films such as zinc oxide doped with aluminum oxide (ZnO:Al2O3) as conductive layer and pure aluminum oxide (Al2O3) as secondary electron emission (SEE) layer were prepared in the pores of MCP via atomic layer deposition (ALD) which is a method that can precisely control thin film thickness on a substrate with a high aspect ratio structure. In this paper, nano-oxide thin films ZnO:Al2O3 and Al2O3 were prepared onto varied kinds of substrates by ALD technique, and the morphology, element distribution, structure, and surface chemical states of samples were systematically investigated by scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoemission spectroscopy (XPS), respectively. Finally, electrical properties of an MCP device as a function of nano-oxide thin film thickness were firstly studied, and the electrical measurement results showed that the average gain of MCP was greater than 2,000 at DC 800 V with nano-oxide thin film thickness approximately 122 nm. During electrical measurement, current jitter was observed, and possible reasons were preliminarily proposed to explain the observed experimental phenomenon.

  10. Epitaxial thin film growth and properties of unconventional oxide superconductors. Cuprates and cobaltates

    Energy Technology Data Exchange (ETDEWEB)

    Krockenberger, Y.

    2006-07-01

    The discovery of high-temperature superconductors has strongly driven the development of suited thin film fabrication methods of complex oxides. One way is the adaptation of molecular beam epitaxy (MBE) for the growth of oxide materials. Another approach is the use of pulsed laser deposition (PLD) which has the advantage of good stoichiometry transfer from target to the substrate. Both techniques are used within this thesis. Epitaxial thin films of new materials are of course needed for future applications. In addition, the controlled synthesis of thin film matter which can be formed far away from thermal equilibrium allows for the investigation of fundamental physical materials properties. (orig.)

  11. Nickel oxide thin film from electrodeposited nickel sulfide thin film: peroxide sensing and photo-decomposition of phenol.

    Science.gov (United States)

    Jana, Sumanta; Samai, Subhasis; Mitra, Bibhas C; Bera, Pulakesh; Mondal, Anup

    2014-09-14

    A novel non-enzymatic peroxide sensor has been constructed by using nickel oxide (NiO) thin films as sensing material, which were prepared by a two-step process: (i) electrodeposition of nickel sulfide (NiS) and (ii) thermal air oxidation of as-deposited NiS to NiO. The resultant material is highly porous and comprises interconnected nanofibers. UV-Vis spectroscopy, FTIR spectroscopy, X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and field-emission scanning electron microscopy (FESEM) were used for a complete characterization of nanostructured NiO thin films. Cyclic voltammetry study shows that NiO/ITO electrode facilitates the oxidation of hydrogen peroxide and exhibits excellent catalytic activity towards its sensing. The amperometric study of NiO/ITO was carried out to determine the sensitivity, linear range, detection limit of the proposed sensor. The sensor exhibits prominent electrocatalytic activity toward the oxidation of H2O2 with a wide linear range and a low detection limit. The possible use of the synthesized NiO thin films as an effective photocatalyst for the decomposition of phenol is also discussed.

  12. Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides.

    Science.gov (United States)

    Nourbakhsh, Amirhasan; Adelmann, Christoph; Song, Yi; Lee, Chang Seung; Asselberghs, Inge; Huyghebaert, Cedric; Brizzi, Simone; Tallarida, Massimo; Schmeisser, Dieter; Van Elshocht, Sven; Heyns, Marc; Kong, Jing; Palacios, Tomás; De Gendt, Stefan

    2015-06-28

    Graphene oxide (GO) was explored as an atomically-thin transferable seed layer for the atomic layer deposition (ALD) of dielectric materials on any substrate of choice. This approach does not require specific chemical groups on the target surface to initiate ALD. This establishes GO as a unique interface which enables the growth of dielectric materials on a wide range of substrate materials and opens up numerous prospects for applications. In this work, a mild oxygen plasma treatment was used to oxidize graphene monolayers with well-controlled and tunable density of epoxide functional groups. This was confirmed by synchrotron-radiation photoelectron spectroscopy. In addition, density functional theory calculations were carried out on representative epoxidized graphene monolayer models to correlate the capacitive properties of GO with its electronic structure. Capacitance-voltage measurements showed that the capacitive behavior of Al2O3/GO depends on the oxidation level of GO. Finally, GO was successfully used as an ALD seed layer for the deposition of Al2O3 on chemically inert single layer graphene, resulting in high performance top-gated field-effect transistors.

  13. Thin film zinc oxide gas sensor fabricated using near-field electrospray

    National Research Council Canada - National Science Library

    Zheng, Gaofeng; Zhu, Ping; Sun, Lingling; Jiang, Jiaxin; Liu, Juan; Wang, Xiang; Li, Wenwang

    2016-01-01

    .... These particles were heated and oxidized to form a zinc oxide (ZnO) semiconductor at 500 °C. The resulting ZnO thin film on the comb electrode was incorporated into a gas sensor, which was examined using a custom built measurement system...

  14. Transparent conductive oxide thin films of tungsten-doped indium oxide

    Energy Technology Data Exchange (ETDEWEB)

    Li Xifeng [Department of Materials Science, Fudan University, Shanghai 200433 (China); Zhang Qun [Department of Materials Science, Fudan University, Shanghai 200433 (China)]. E-mail: zhangqun@fudan.edu.cn; Miao Weina [Department of Materials Science, Fudan University, Shanghai 200433 (China); Huang Li [Department of Materials Science, Fudan University, Shanghai 200433 (China); Zhang Zhuangjian [Department of Materials Science, Fudan University, Shanghai 200433 (China)

    2006-12-05

    Transparent conductive oxide thin film of tungsten-doped In{sub 2}O{sub 3} (IWO) has been prepared by reactive direct current magnetron sputtering from the tungsten-embedded indium metal target. The effect of tungsten doping content on the optoelectrical properties of IWO films was investigated. The lowest resistivity of 2.7 x 10{sup -4} {omega}.cm was reproducibly obtained, with carrier mobility greater than 57 cm{sup 2} V{sup -1} s{sup -1} and carrier concentration of 4.0 x 10{sup 20} cm{sup -3}, as well as the transmission in visible light range exceeding 80%. X-ray diffraction measurements indicate that the as-deposited IWO films are well crystallized with a preferential orientation of (222)

  15. Room temperature transparent conducting oxides based on zinc oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Clatot, J. [Laboratoire de Reactivite et de Chimie des Solides, UMR CNRS 6007, 33, rue Saint-Leu, 80039 Amiens (France); Campet, G. [Institut de Chimie de la Matiere Condensee de Bordeaux (ICMCB), CNRS, 87 Avenue du Docteur A. Schweitzer, 33608 Pessac Cedex (France); Zeinert, A. [Laboratoire de Physique de la Matiere Condensee, Universite de Picardie Jules Verne, 33 rue St. Leu, 80039, Amiens (France); Labrugere, C. [Institut de Chimie de la Matiere Condensee de Bordeaux (ICMCB), CNRS, 87 Avenue du Docteur A. Schweitzer, 33608 Pessac Cedex (France); Rougier, A., E-mail: aline.rougier@u-picardie.fr [Laboratoire de Reactivite et de Chimie des Solides, UMR CNRS 6007, 33, rue Saint-Leu, 80039 Amiens (France)

    2011-04-01

    Doped zinc oxide thin films are grown on glass substrate at room temperature under oxygen atmosphere, using pulsed laser deposition (PLD). O{sub 2} pressure below 1 Pa leads to conductive films. A careful characterization of the film stoichiometry and microstructure using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) concludes on a decrease in crystallinity with Al and Ga additions ({<=}3%). The progressive loss of the (0 0 2) orientation is associated with a variation of the c parameter value as a function of the film thickness and substrate nature. ZnO:Al and ZnO:Ga thin films show a high optical transmittance (>80%) with an increase in band gap from 3.27 eV (pure ZnO) to 3.88 eV and 3.61 eV for Al and Ga doping, respectively. Optical carrier concentration, optical mobility and optical resistivity are deduced from simulation of the optical data.

  16. Imposed quasi-layer-by-layer homoepitaxial growth of SrTiO3 films by large area pulsed laser deposition

    DEFF Research Database (Denmark)

    Chen, Yunzhong; Pryds, Nini

    2011-01-01

    The homoepitaxial growth of SrTiO3 (STO) films was investigated by a large-area pulsed laser deposition (PLD), which was in-situ monitored by a high pressure reflective high energy electron diffraction. By combining a conventionally continuous film deposition with a followed interval relaxation......, a persistent layer-by-layer (LBL) film growth of more than 100 unit cells STO films was achieved. This interrupted PLD technique could realize persistent LBL film growth at any laser frequency between 1 and 10 Hz and provides an effective way to fabricate high quality complex oxide films on unit cell scale....

  17. Transparent conductive zinc oxide basics and applications in thin film solar cells

    CERN Document Server

    Klein, Andreas; Rech, Bernd

    2008-01-01

    Zinc oxide (ZnO) belongs to the class of transparent conducting oxides which can be used as transparent electrodes in electronic devices or heated windows. In this book the material properties of, the deposition technologies for, and applications of zinc oxide in thin film solar cells are described in a comprehensive manner. Structural, morphological, optical and electronic properties of ZnO are treated in this review. The editors and authors of this book are specialists in deposition, analysis and fabrication of thin-film solar cells and especially of ZnO. This book is intended as an overview and a data collection for students, engineers and scientist.

  18. Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layers

    Energy Technology Data Exchange (ETDEWEB)

    Puttaswamy, Manjunath; Vehkamäki, Marko [University of Helsinki, Department of Chemistry, P.O. Box 55, FI-00014 Helsinki (Finland); Kukli, Kaupo, E-mail: kaupo.kukli@helsinki.fi [University of Helsinki, Department of Chemistry, P.O. Box 55, FI-00014 Helsinki (Finland); University of Tartu, Institute of Physics, W. Ostwald 1, EE-50411 Tartu (Estonia); Dimri, Mukesh Chandra [National Institute of Chemical Physics and Biophysics, Akadeemia tee 23, EE-12618 Tallinn (Estonia); Kemell, Marianna; Hatanpää, Timo; Heikkilä, Mikko J. [University of Helsinki, Department of Chemistry, P.O. Box 55, FI-00014 Helsinki (Finland); Mizohata, Kenichiro [University of Helsinki, Department of Physics, P.O. Box 64, FI-00014 Helsinki (Finland); Stern, Raivo [National Institute of Chemical Physics and Biophysics, Akadeemia tee 23, EE-12618 Tallinn (Estonia); Ritala, Mikko; Leskelä, Markku [University of Helsinki, Department of Chemistry, P.O. Box 55, FI-00014 Helsinki (Finland)

    2016-07-29

    Bismuth iron oxide films with varying contributions from Fe{sub 2}O{sub 3} or Bi{sub 2}O{sub 3} were prepared using atomic layer deposition. Bismuth (III) 2,3-dimethyl-2-butoxide, was used as the bismuth source, iron(III) tert-butoxide as the iron source and water vapor as the oxygen source. The films were deposited as stacks of alternate Bi{sub 2}O{sub 3} and Fe{sub 2}O{sub 3} layers. Films grown at 140 °C to the thickness of 200–220 nm were amorphous, but crystallized upon post-deposition annealing at 500 °C in nitrogen. Annealing of films with intermittent bismuth and iron oxide layers grown to different thicknesses influenced their surface morphology, crystal structure, composition, electrical and magnetic properties. Implications of multiferroic performance were recognized in the films with the remanent charge polarization varying from 1 to 5 μC/cm{sup 2} and magnetic coercivity varying from a few up to 8000 A/m. - Highlights: • Bismuth iron oxide thin films were grown by atomic layer deposition at 140 °C. • The major phase formed in the films upon annealing at 500 °C was BiFeO{sub 3}. • BiFeO{sub 3} films and films containing excess Bi favored electrical charge polarization. • Slight excess of iron oxide enhanced saturative magnetization behavior.

  19. Tin etching from metallic and oxidized scandium thin films

    NARCIS (Netherlands)

    Pachecka, Malgorzata; Lee, Christopher James; Sturm, J.M.; Bijkerk, Frederik

    The role of oxide on Sn adhesion to Sc surfaces was studied with in-situ ellipsometry, X-ray photoelectron spectroscopy and secondary electron microscopy. Sn etching with hydrogen radicals was performed on metallic Sc, metallic Sc with a native oxide, and a fully oxidized Sc layer. The results show

  20. Tin etching from metallic and oxidized scandium thin films

    Science.gov (United States)

    Pachecka, M.; Lee, C. J.; Sturm, J. M.; Bijkerk, F.

    2017-08-01

    The role of oxide on Sn adhesion to Sc surfaces was studied with in-situ ellipsometry, X-ray photoelectron spectroscopy and secondary electron microscopy. Sn etching with hydrogen radicals was performed on metallic Sc, metallic Sc with a native oxide, and a fully oxidized Sc layer. The results show that Sn adsorbs rather weakly to a non-oxidized Sc surface, and is etched relatively easily by atomic hydrogen. In contrast, the presence of native oxide on Sc allows Sn to adsorb more strongly to the surface, slowing the etching. Furthermore, thinner layers of scandium oxide result in weaker Sn adsorption, indicating that the layer beneath the oxide plays a significant role in determining the adsorption strength. Unexpectedly, for Sn on Sc2O3, and, to a lesser extent, for Sn on Sc, the etch rate shows a variation over time, which is explained by surface restructuring, temperature change, and hydrogen adsorption saturation.

  1. Tin etching from metallic and oxidized scandium thin films

    Directory of Open Access Journals (Sweden)

    M. Pachecka

    2017-08-01

    Full Text Available The role of oxide on Sn adhesion to Sc surfaces was studied with in-situ ellipsometry, X-ray photoelectron spectroscopy and secondary electron microscopy. Sn etching with hydrogen radicals was performed on metallic Sc, metallic Sc with a native oxide, and a fully oxidized Sc layer. The results show that Sn adsorbs rather weakly to a non-oxidized Sc surface, and is etched relatively easily by atomic hydrogen. In contrast, the presence of native oxide on Sc allows Sn to adsorb more strongly to the surface, slowing the etching. Furthermore, thinner layers of scandium oxide result in weaker Sn adsorption, indicating that the layer beneath the oxide plays a significant role in determining the adsorption strength. Unexpectedly, for Sn on Sc2O3, and, to a lesser extent, for Sn on Sc, the etch rate shows a variation over time, which is explained by surface restructuring, temperature change, and hydrogen adsorption saturation.

  2. Thermochemical hydrogen generation of indium oxide thin films

    Directory of Open Access Journals (Sweden)

    Taekyung Lim

    2017-03-01

    Full Text Available Development of alternative energy resources is an urgent requirement to alleviate current energy constraints. As such, hydrogen gas is gaining attention as a future alternative energy source to address existing issues related to limited energy resources and air pollution. In this study, hydrogen generation by a thermochemical water-splitting process using two types of In2O3 thin films was investigated. The two In2O3 thin films prepared by chemical vapor deposition (CVD and sputtering deposition systems contained different numbers of oxygen vacancies, which were directly related to hydrogen generation. The as-grown In2O3 thin film prepared by CVD generated a large amount of hydrogen because of its abundant oxygen vacancies, while that prepared by sputtering had few oxygen vacancies, resulting in low hydrogen generation. Increasing the temperature of the In2O3 thin film in the reaction chamber caused an increase in hydrogen generation. The oxygen-vacancy-rich In2O3 thin film is expected to provide a highly effective production of hydrogen as a sustainable and efficient energy source.

  3. Ultraviolet optical functions of ZnO and Ga2O3 thin films

    Science.gov (United States)

    Fujita, Shizuo

    2008-08-01

    Oxide semiconductors are essentially stable and environmental-friendly materials as well as possessing unique multifunctional properties in conjunction with ultraviolet (UV) to deep UV (DUV) optical functions. Among them ZnO and Ga2O3, having the bandgaps of about 3.3 and 4.9eV, respectively, are the promising candidates for exploring their UV applications. This paper reports recent advances of ZnO and Ga2O3 semiconductors focusing on their UV to DUV optical functions and device applications. Since ZnO has reached to the actual application stage and future development of the growth with chemical vapor deposition (CVD) is now strongly requested for mass production, here we introduce a novel CVD growth technique, that is, ultrasonic spray assisted CVD, allowing safe and low-cost growth of high quality ZnO-based films. Homoepitaxy on ZnO substrates resulted in step-flow growth, which has hardly been achieved by metalorganic CVD. Ga2O3 is expected for its DUV functions being supported by the availability of Ga2O3 bulk substrates. We show the potential applications of Ga2O3 substrates for highly sensitive DUV photodetectors as well as homoepitaxial step-flow growth of Ga2O3 thin films by molecular beam epitaxy.

  4. Graphene oxide on magnetron sputtered silver thin films for SERS and metamaterial applications

    Science.gov (United States)

    Politano, Grazia Giuseppina; Cazzanelli, Enzo; Versace, Carlo; Vena, Carlo; De Santo, Maria Penelope; Castriota, Marco; Ciuchi, Federica; Bartolino, Roberto

    2018-01-01

    In the last years the potential of combining the attractive materials characteristics of graphene related materials and silver nanostructures for SERS and metamaterials has emerged. Here, we report of graphene oxide thin films deposited by dip-coating on magnetron sputtered silver thin films. Our work represents a novelty in the field of the study of graphene oxide- silver composites, since magnetron sputtering deposition is an alternative way to silver thin films fabrication; previous works used instead silver nitrate aqueous solution mixed with the graphene oxide. Micro-Raman technique, morphological analysis and variable angle spectroscopic ellipsometry were performed. The final SERS signal intensity was investigated and we found Raman peaks dependent on the intensity of the laser and the thickness of silver and GO films. These results could open somestudies on plasmonics and on the reduction of graphene oxide mediated by silver thin films. Moreover, effective medium theory calculations show the possible use of these graphene oxide/silver thin films in multilayer hyperbolic metamaterials for optical applications.

  5. Preparation and characterization of CdO thin films obtained by thermal oxidation of evaporated Cd thin films

    Science.gov (United States)

    Danţuş, C.; Rusu, G. G.; Dobromir, M.; Rusu, M.

    2008-12-01

    CdO thin films ( d = 300-400 nm) were prepared by thermal oxidation of metallic Cd thin films, vacuum evaporated onto unheated glass substrates. The as-deposited Cd films were subsequently heat treated in open atmosphere in two manners: by slowly heating, with rate of 5 K/min up to the temperature of 650 K and maintained at this temperature for 5 min, and by flash heating for 5 min at the same temperature of 650 K. The effect of oxidation procedure on the crystalline structure and electrical (temperature dependence of electrical conductivity) and optical (transmission and reflection spectra) properties of as obtained CdO films was investigated. All obtained CdO films are polycrystalline with strong preferential orientation with (1 1 1) plane parallel to the substrate. Depending on the oxidation conditions, the electrical conductivity at room temperature varied in the range 5 × 10 to 5 × 10 4 Ω -1 m -1. Also, the optical band gap was found to be of 2.20-2.22 eV for direct transitions and of 1.83-1.92 eV for the indirect ones. In this paper, the obtained results are correlated with the oxidation process that takes place during film annealing.

  6. Thermal oxidation of Zr–Cu–Al–Ni amorphous metal thin films

    Energy Technology Data Exchange (ETDEWEB)

    Oleksak, R.P.; Hostetler, E.B.; Flynn, B.T. [School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97331 (United States); McGlone, J.M.; Landau, N.P.; Wager, J.F. [School of Electrical Engineering and Computer Science, Oregon State University, Corvallis, OR 97331 (United States); Stickle, W.F. [Hewlett-Packard Company, Corvallis, OR 97333 (United States); Herman, G.S., E-mail: greg.herman@oregonstate.edu [School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, OR 97331 (United States)

    2015-11-30

    The initial stages of thermal oxidation for Zr–Cu–Al–Ni amorphous metal thin films were investigated using X-ray photoelectron spectroscopy, transmission electron microscopy and energy dispersive X-ray spectroscopy. The as-deposited films had oxygen incorporated during sputter deposition, which helped to stabilize the amorphous phase. After annealing in air at 300 °C for short times (5 min) this oxygen was found to segregate to the surface or buried interface. Annealing at 300 °C for longer times leads to significant composition variation in both vertical and lateral directions, and formation of a surface oxide layer that consists primarily of Zr and Al oxides. Surface oxide formation was initially limited by back-diffusion of Cu and Ni (< 30 min), and then by outward diffusion of Zr (> 30 min). The oxidation properties are largely consistent with previous observations of Zr–Cu–Al–Ni metallic glasses, however some discrepancies were observed which could be explained by the unique sample geometry of the amorphous metal thin films. - Highlights: • Thermal oxidation of amorphous Zr–Cu–Al–Ni thin films was investigated. • Significant short-range inhomogeneities were observed in the amorphous films. • An accumulation of Cu and Ni occurs at the oxide/metal interface. • Diffusion of Zr was found to limit oxide film growth.

  7. Transparent conducting oxide layers for thin film silicon solar cells

    NARCIS (Netherlands)

    Rath, J.K.|info:eu-repo/dai/nl/304830585; Liu, Y.|info:eu-repo/dai/nl/304831743; de Jong, M.M.|info:eu-repo/dai/nl/325844208; de Wild, J.|info:eu-repo/dai/nl/314641378; Schuttauf, J.A.|info:eu-repo/dai/nl/314118039; Brinza, M.|info:eu-repo/dai/nl/304823325; Schropp, R.E.I.|info:eu-repo/dai/nl/072502584

    2009-01-01

    Texture etching of ZnO:1%Al layers using diluted HCl solution provides excellent TCOs with crater type surface features for the front contact of superstrate type of thin film silicon solar cells. The texture etched ZnO:Al definitely gives superior performance than Asahi SnO2:F TCO in case of

  8. Gas sensing application of nanocrystalline zinc oxide thin films ...

    Indian Academy of Sciences (India)

    Experimental data revealed the sensors to be more selective to NO2 gas with satisfactory response and recovery time. Keywords. ZnO; thin film; spray .... to measure gas sens- ing characteristics due to the sluggish recovery kinetics. .... AuS by reaction of H2S on the gold nanoparticles was also reported by Shirsat et al.72 ...

  9. Assessment of Cellulose Acetate/Manganese Oxide Thin Film as ...

    Indian Academy of Sciences (India)

    5

    industry during the last few decades, large amounts of chemical compounds and contaminants have emerged to the environment [1]. The analysis of these .... at 4.0°C. To probe the selectivity of the synthesized adsorbents, batch adsorption experiments were performed by adding 10 mg of each thin film (CA/Mn-1 and ...

  10. Chemical Vapor Deposition of Aluminum Oxide Thin Films

    Science.gov (United States)

    Vohs, Jason K.; Bentz, Amy; Eleamos, Krystal; Poole, John; Fahlman, Bradley D.

    2010-01-01

    Chemical vapor deposition (CVD) is a process routinely used to produce thin films of materials via decomposition of volatile precursor molecules. Unfortunately, the equipment required for a conventional CVD experiment is not practical or affordable for many undergraduate chemistry laboratories, especially at smaller institutions. In an effort to…

  11. Epitaxial oxide thin films by pulsed laser deposition: Retrospect and ...

    Indian Academy of Sciences (India)

    Unknown

    Among the large number of processes to fabricate thin films of materials, pulsed laser deposition (PLD) has emerged as a ... It is important to recognize that highly stoichiometric, nearly single crystal like epitaxial film is aimed for in the PLD .... This new class of Josephson junctions is attractive for novel phase devices.

  12. Oriented growth of thin films of samarium oxide by MOCVD

    Indian Academy of Sciences (India)

    Unknown

    Abstract. Thin films of Sm2O3 have been grown on Si(100) and fused quartz by low-pressure chemical va- pour deposition using an adducted β-diketonate precursor. The films on quartz are cubic, with no preferred orientation at lower growth temperatures (~ 550°C), while they grow with a strong (111) orientation as the.

  13. Vanadium oxide thin films deposited on silicon dioxide buffer layers by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Chen Sihai [Department of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China) and Wuhan National laboratory for Optoelectronics, Wuhan 430074 (China)]. E-mail: cshai99@yahoo.com; Ma Hong [Department of Electronics and Information Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Wang Shuangbao [Department of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Shen Nan [Department of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Xiao Jing [Department of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Zhou Hao [Department of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Zhao Xiaomei [Department of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Wuhan National laboratory for Optoelectronics, Wuhan 430074 (China); Li Yi [Department of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); State Key Laboratory for Imaging Recognization and Intelligence Control, Huazhong University of Science and Technology, Wuhan 430074 (China); Yi Xinjian [State Key Laboratory for Imaging Recognization and Intelligence Control, Huazhong University of Science and Technology, Wuhan 430074 (China)

    2006-02-21

    Thin films made by vanadium oxide have been obtained by direct current magnetron sputtering method on SiO{sub 2} buffer layers. A detailed electrical and structural characterization has been performed on the deposited films by four-point probe method and scanning electron microscopy (SEM). At room temperature, the four-point probe measurement result presents the resistance of the film to be 25 kU/sheet. The temperature coefficient of resistance is - 2.0%/K. SEM image indicates that the vanadium oxide exhibits a submicrostructure with lamella size ranging from 60 nm to 300 nm. A 32 x 32-element test microbolometer was fabricated based on the deposited thin film. The infrared response testing showed that the response was 200 mV. The obtained results allow us to conclude that the vanadium oxide thin films on SiO{sub 2} buffer layers is suitable for uncooled focal plane arrays applications.

  14. Chemically derived graphene oxide: towards large-area thin-film electronics and optoelectronics.

    Science.gov (United States)

    Eda, Goki; Chhowalla, Manish

    2010-06-11

    Chemically derived graphene oxide (GO) possesses a unique set of properties arising from oxygen functional groups that are introduced during chemical exfoliation of graphite. Large-area thin-film deposition of GO, enabled by its solubility in a variety of solvents, offers a route towards GO-based thin-film electronics and optoelectronics. The electrical and optical properties of GO are strongly dependent on its chemical and atomic structure and are tunable over a wide range via chemical engineering. In this Review, the fundamental structure and properties of GO-based thin films are discussed in relation to their potential applications in electronics and optoelectronics.

  15. Roll-to-Roll Transfer Printing of Reduced Graphene Oxide Thin Film

    OpenAIRE

    Jang, Hyun-Woo

    2015-01-01

    A novel thin film transfer mechanism has been studied and developed to transfer chemically reduced graphene oxide (r-GO) thin film using a roll-to-roll printing system. We discover that shear stress generated on the silicon rubber stamp surface facilitates delamination of the deposited r-GO thin film efficiently.A roll-to-roll apparatus is assembled to demonstrate the shear-induced transfer printing in a large scale printing system. Shear stress is applied on the stamp surface by rotating the...

  16. Room-temperature fabrication of light-emitting thin films based on amorphous oxide semiconductor

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Junghwan, E-mail: JH.KIM@lucid.msl.titech.ac.jp; Miyokawa, Norihiko; Ide, Keisuke [Materials and Structures Laboratory, Tokyo Institute of Technology, Mailbox R3-4, 4259 Nagatsuta, Midori-ku, Yokohama (Japan); Toda, Yoshitake [Materials Research Center for Element Strategy, Tokyo Institute of Technology, Mailbox SE-6, 4259 Nagatsuta, Midori-ku, Yokohama (Japan); Hiramatsu, Hidenori; Hosono, Hideo; Kamiya, Toshio [Materials and Structures Laboratory, Tokyo Institute of Technology, Mailbox R3-4, 4259 Nagatsuta, Midori-ku, Yokohama (Japan); Materials Research Center for Element Strategy, Tokyo Institute of Technology, Mailbox SE-6, 4259 Nagatsuta, Midori-ku, Yokohama (Japan)

    2016-01-15

    We propose a light-emitting thin film using an amorphous oxide semiconductor (AOS) because AOS has low defect density even fabricated at room temperature. Eu-doped amorphous In-Ga-Zn-O thin films fabricated at room temperature emitted intense red emission at 614 nm. It is achieved by precise control of oxygen pressure so as to suppress oxygen-deficiency/excess-related defects and free carriers. An electronic structure model is proposed, suggesting that non-radiative process is enhanced mainly by defects near the excited states. AOS would be a promising host for a thin film phosphor applicable to flexible displays as well as to light-emitting transistors.

  17. Zinc-oxide nanorod/copper-oxide thin-film heterojunction for a nitrogen-monoxide gas sensor

    Science.gov (United States)

    Yoo, Hwansu; Kim, Hyojin; Kim, Dojin

    2014-11-01

    A novel p- n oxide heterojunction structure was fabricated by employing n-type zinc-oxide (ZnO) nanorods grown on an indium-tin-oxide-coated glass substrate by using the hydrothermal method and a p-type copper-oxide (CuO) thin film deposited onto the ZnO nanorod array by using the sputtering method. The crystallinities and microstructures of the heterojunction materials were examined by using X-ray diffraction and scanning electron microscopy. The observed current-voltage characteristics of the p - n oxide heterojunction showed a nonlinear diode-like rectifying behavior. The effects of an oxidizing or electron acceptor gas, such as nitrogen monoxide (NO), on the ZnO nanorod/CuO thin-film heterojunction were investigated to determine the potential applications of the fabricated material for use in gas sensors. The forward current of the p - n heterojunction was remarkably reduced when NO gas was introduced into dry air at temperatures from 100 to 250 °C. The NO gas response of the oxide heterojunction reached a maximum value at an operating temperature of 180 °C and linearly increased as the NO gas concentration was increased from 5 to 30 ppm. The sensitivity value was observed to be as high as 170% at 180 °C when biased at 2 V in the presence of 20-ppm NO. The ZnO nanorod/CuO thin-film heterojunction also exhibited a stable and repeatable response to NO gas. The experimental results suggest that the ZnO nanorod/CuO thin-film heterojunction structure may be a novel candidate for gas sensors.

  18. Zinc-oxide nanorod / copper-oxide thin-film heterojunction for a nitrogen-monoxide gas sensor

    Energy Technology Data Exchange (ETDEWEB)

    Yoo, Hwansu; Kim, Hyojin; Kim, Dojin [Chungnam National University, Daejeon (Korea, Republic of)

    2014-11-15

    A novel p - n oxide heterojunction structure was fabricated by employing n-type zinc-oxide (ZnO) nanorods grown on an indium-tin-oxide-coated glass substrate by using the hydrothermal method and a p-type copper-oxide (CuO) thin film deposited onto the ZnO nanorod array by using the sputtering method. The crystallinities and microstructures of the heterojunction materials were examined by using X-ray diffraction and scanning electron microscopy. The observed current - voltage characteristics of the p - n oxide heterojunction showed a nonlinear diode-like rectifying behavior. The effects of an oxidizing or electron acceptor gas, such as nitrogen monoxide (NO), on the ZnO nanorod/CuO thin-film heterojunction were investigated to determine the potential applications of the fabricated material for use in gas sensors. The forward current of the p - n heterojunction was remarkably reduced when NO gas was introduced into dry air at temperatures from 100 to 250 .deg. C. The NO gas response of the oxide heterojunction reached a maximum value at an operating temperature of 180 .deg. C and linearly increased as the NO gas concentration was increased from 5 to 30 ppm. The sensitivity value was observed to be as high as 170% at 180 .deg. C when biased at 2 V in the presence of 20-ppm NO. The ZnO nanorod/CuO thin-film heterojunction also exhibited a stable and repeatable response to NO gas. The experimental results suggest that the ZnO nanorod/CuO thin-film heterojunction structure may be a novel candidate for gas sensors.

  19. Effect of oxygen deficiency on electronic properties and local structure of amorphous tantalum oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Denny, Yus Rama [Department of Physics Education, University of Sultan Ageng Tirtayasa, Banten 42435 (Indonesia); Firmansyah, Teguh [Department of Electrical Engineering, University of Sultan Ageng Tirtayasa, Banten 42435 (Indonesia); Oh, Suhk Kun [Department of Physics, Chungbuk National University, Cheongju 28644 (Korea, Republic of); Kang, Hee Jae, E-mail: hjkang@cbu.ac.kr [Department of Physics, Chungbuk National University, Cheongju 28644 (Korea, Republic of); Yang, Dong-Seok [Department of Physics Education, Chungbuk National University, Cheongju 28644 (Korea, Republic of); Heo, Sung; Chung, JaeGwan; Lee, Jae Cheol [Analytical Engineering Center, Samsung Advanced Institute of Technology, Suwon 16678 (Korea, Republic of)

    2016-10-15

    Highlights: • The effect of oxygen flow rate on electronic properties and local structure of tantalum oxide thin films was studied. • The oxygen deficiency induced the nonstoichiometric state a-TaOx. • A small peak at 1.97 eV above the valence band side appeared on nonstoichiometric Ta{sub 2}O{sub 5} thin films. • The oxygen flow rate can change the local electronic structure of tantalum oxide thin films. - Abstract: The dependence of electronic properties and local structure of tantalum oxide thin film on oxygen deficiency have been investigated by means of X-ray photoelectron spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), and X-ray absorption spectroscopy (XAS). The XPS results showed that the oxygen flow rate change results in the appearance of features in the Ta 4f at the binding energies of 23.2 eV, 24.4 eV, 25.8, and 27.3 eV whose peaks are attributed to Ta{sup 1+}, Ta{sup 2+}, Ta{sup 3+}/Ta{sup 4+}, and Ta{sup 5+}, respectively. The presence of nonstoichiometric state from tantalum oxide (TaOx) thin films could be generated by the oxygen vacancies. In addition, XAS spectra manifested both the increase of coordination number of the first Ta-O shell and a considerable reduction of the Ta-O bond distance with the decrease of oxygen deficiency.

  20. Nondestructive measurement of homoepitaxially grown GaN film thickness with Fourier transform infrared spectroscopy

    Science.gov (United States)

    Horikiri, Fumimasa; Narita, Yoshinobu; Yoshida, Takehiro

    2017-12-01

    In vertical devices containing GaN homoepitaxial layers on GaN substrates, the layer thickness is a key parameter that needs to be clarified before starting the device process. We applied Fourier transform infrared spectroscopy (FT-IR) to a homoepitaxially grown GaN film that consisted of an n‑-GaN layer. The estimated film thickness from the FT-IR spectrum agreed well with the results of cross-sectional scanning electron microscope cathodoluminescence images. This is the first report of nondestructive film thickness measurements for homoepitaxially grown GaN and indicates the applicability of FT-IR to the nondestructive inspection of vertical GaN power devices.

  1. Self-limiting layer-by-layer oxidation of atomically thin WSe2.

    Science.gov (United States)

    Yamamoto, Mahito; Dutta, Sudipta; Aikawa, Shinya; Nakaharai, Shu; Wakabayashi, Katsunori; Fuhrer, Michael S; Ueno, Keiji; Tsukagoshi, Kazuhito

    2015-03-11

    Growth of a uniform oxide film with a tunable thickness on two-dimensional transition metal dichalcogenides is of great importance for electronic and optoelectronic applications. Here we demonstrate homogeneous surface oxidation of atomically thin WSe2 with a self-limiting thickness from single- to trilayers. Exposure to ozone (O3) below 100 °C leads to the lateral growth of tungsten oxide selectively along selenium zigzag-edge orientations on WSe2. With further O3 exposure, the oxide regions coalesce and oxidation terminates leaving a uniform thickness oxide film on top of unoxidized WSe2. At higher temperatures, oxidation evolves in the layer-by-layer regime up to trilayers. The oxide films formed on WSe2 are nearly atomically flat. Using photoluminescence and Raman spectroscopy, we find that the underlying single-layer WSe2 is decoupled from the top oxide but hole-doped. Our findings offer a new strategy for creating atomically thin heterostructures of semiconductors and insulating oxides with potential for applications in electronic devices.

  2. Oxidation of Light Alkanes Using Photocatalytic Thin Films

    Science.gov (United States)

    2006-01-01

    thermodynamically unfavorable reaction. Titanium dioxide ( TiO2 ) is the most prominent and widely used semiconductor in the field of photocatalysis . Titania has...2.5.1 Mixed Oxide Systems Mixed oxide systems typically consist of TiO2 with small quantities (ង%) of a second metal oxide added...demonstrated that mixing TiO2 with ZrO2 and SiO2 improved photocatalytic rates by more than 2 times compared to plain TiO2 . Small quantities (ក

  3. Improved interface properties of GaN-based metal-oxide-semiconductor devices with thin Ga-oxide interlayers

    Science.gov (United States)

    Yamada, Takahiro; Ito, Joyo; Asahara, Ryohei; Watanabe, Kenta; Nozaki, Mikito; Hosoi, Takuji; Shimura, Takayoshi; Watanabe, Heiji

    2017-06-01

    The impact of thin Ga-oxide (GaOx) interlayers on the electrical properties of GaN-based metal-oxide-semiconductor (MOS) devices was systematically investigated. Thin thermal oxides formed at around 900 °C were found to be beneficial for improving the electrical properties of insulator/GaN interfaces, despite the fact that thermal oxidation of GaN surfaces at high temperatures proceeds by means of grain growth. Consequently, well-behaved capacitance-voltage characteristics of SiO2/GaOx/n-GaN stacked MOS capacitors with an interface state density (Dit) as low as 1.7 × 1011 cm-2 eV-1 were demonstrated. Moreover, the Dit value was further reduced for the SiO2/GaOx/GaN capacitor with a 2-nm-thick sputter-deposited GaOx interlayer. These results clearly indicate the intrinsically superior nature of the oxide/GaN interfaces and provide plausible guiding principles for fabricating high-performance GaN-MOS devices with thin GaOx interlayers.

  4. Picosecond laser registration of interference pattern by oxidation of thin Cr films

    Energy Technology Data Exchange (ETDEWEB)

    Veiko, Vadim; Yarchuk, Michail [ITMO University, Kronverksky Ave. 49, St. Petersburg, 197101 (Russian Federation); Zakoldaev, Roman, E-mail: zakoldaev@gmail.com [ITMO University, Kronverksky Ave. 49, St. Petersburg, 197101 (Russian Federation); Gedvilas, Mindaugas; Račiukaitis, Gediminas [Center for Physical Sciences and Technology, Savanoriu Ave. 231, LT-02300, Vilnius (Lithuania); Kuzivanov, Michail; Baranov, Alexander [ITMO University, Kronverksky Ave. 49, St. Petersburg, 197101 (Russian Federation)

    2017-05-15

    Highlights: • Periodical patterning of thin films was achieved by combining two technologies. • Selective chemical etching was combined with laser-induced oxidation. • Formation of the protective oxide layer prevented of chromium film from etching. • 1D binary grating with the chromium stripe width of 750 nm was fabricated. - Abstract: The laser oxidation of thin metallic films followed by its selective chemical etching is a promising method for the formation of binary metal structures on the glass substrates. It is important to confirm that even a single ultrashort laser pulse irradiation is able to create the protective oxide layer that makes possible to imprint the thermochemical image. Results of the thermo-chemical treatment of thin chromium films irradiated by picosecond laser pulse utilizing two and four beam interference combined with the chemical etching are presented. The spatial resolution of this method can be high enough due to thermo-chemical sharpening and can be close to the diffraction limit. Micro-Raman spectroscopy was applied for characterization of the chemical composition of the protective oxide layers formed under atmospheric conditions on the surface of thin chromium films.

  5. Toward an Understanding of Thin-Film Transistor Performance in Solution-Processed Amorphous Zinc Tin Oxide (ZTO) Thin Films.

    Science.gov (United States)

    Sanctis, Shawn; Koslowski, Nico; Hoffmann, Rudolf; Guhl, Conrad; Erdem, Emre; Weber, Stefan; Schneider, Jörg J

    2017-06-28

    Amorphous zinc tin oxide (ZTO) thin films are accessible by a molecular precursor approach using mononuclear zinc(II) and tin(II) compounds with methoxyiminopropionic acid ligands. Solution processing of two precursor solutions containing a mixture of zinc and tin(II)-methoxyiminopropinato complexes results in the formation of smooth homogeneous thin films, which upon calcination are converted into the desired semiconducting amorphous ZTO thin films. ZTO films integrated within a field-effect transistor (FET) device exhibit an active semiconducting behavior in the temperature range between 250 and 400 °C, giving an increased performance, with mobility values between μ = 0.03 and 5.5 cm 2 /V s, with on/off ratios increasing from 10 5 to 10 8 when going from 250 to 400 °C. Herein, our main emphasis, however, was on an improved understanding of the material transformation pathway from weak to high performance of the semiconductor in a solution-processed FET as a function of the processing temperature. We have correlated this with the chemical composition and defects states within the microstructure of the obtained ZTO thin film via photoelectron spectroscopy (X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy), Auger electron spectroscopy, electron paramagnetic resonance spectroscopy, atomic force microscopy, and photoluminescence investigations. The critical factor observed for the improved performance within this ZTO material could be attributed to a higher tin concentration, wherein the contributions of point defects arising from the tin oxide within the final amorphous ZTO material play the dominant role in governing the transistor performance.

  6. Hot-filament metal oxide deposition (HFMOD: a novel method for depositing thin films of metallic oxides

    Directory of Open Access Journals (Sweden)

    Rouxinol F. Paulo

    2004-01-01

    Full Text Available This short report describes a novel method for the synthesis of metal oxide thin films. The experimental setup consists of a metal filament installed inside a vacuum chamber. The filament can be heated by an ac power supply while oxygen is admitted into the chamber using a mass flowmeter. From reactions between oxygen and the heated metal filament, volatile oxide species, Me xOy, where Me is the metal, can be formed, condensing on a nearby substrate. We have observed that thin films of WxOy and Mo xOy can be satisfactorily deposited by this novel method. Although several techniques were used to characterize the oxides, this note emphasizes the results obtained by X-ray Photoelectron Spectroscopy (XPS.

  7. Effects of working pressure on physical properties of tungsten-oxide thin films sputtered from oxide target

    Energy Technology Data Exchange (ETDEWEB)

    Riech, I.; Acosta, M.; Pena, J. L.; Bartolo-Perez, P. [Laboratorio de Ciencia de Materiales, Facultad de Ingenieria, Universidad Autonoma de Yucatan, A. P 150. Cordemex, Merida, Yucatan 97130 (Mexico); Departamento de Fisica Aplicada, CINVESTAV-IPN Unidad Merida, A.P. 73 Cordemex, Merida, Yucatan 97130 (Mexico)

    2010-03-15

    Tungsten-oxide films were deposited on glass substrates from a metal-oxide target by nonreactive radio-frequency sputtering. The authors have studied the effect that changing Ar gas pressure has on the electrical, optical, and chemical composition in the thin films. Resistivity of WO{sub 3} changed ten orders of magnitude with working gas pressure values from 20 to 80 mTorr. Thin films deposited at 20 mTorr of Ar sputtering pressure showed lower resistivity and optical transmittance. X-ray photoelectron spectroscopy (XPS) measurements revealed similar chemical composition for all samples irrespective of Ar pressure used. However, XPS analyses of the evolution of W 4f and O 1s peaks indicated a mixture of oxides dependent on the Ar pressure used during deposition.

  8. Optical and structural characterization of iron oxide and cobalt oxide thin films at 800 nm

    Science.gov (United States)

    Garcia, Hans A.; de Melo, Ronaldo P.; Azevedo, Antonio; de Araújo, Cid B.

    2013-05-01

    We report on optical and structural properties of α-Fe2O3 and Co3O4 thin films, grown by direct oxidation of pure metal films deposited on soda-lime glass. Structural characteristics and morphology of the films were investigated by X-ray diffraction, atomic force microscopy, and scanning electron microscopy. Linear optical absorption, and linear refraction as well as nonlinear optical properties were investigated. The third-order optical susceptibilities were measured applying the Thermally managed Z- scan technique using a Ti: sapphire laser (150 fs; 800 nm). The results obtained for the Co3O4 film were {Re} χ^{( 3 )} = -(5.7 ± 2.4) ×10-9 esu and {Im} χ^{(3)} = -(1.8 ± 0.2) ×10-8 esu while for the α-Fe2O3 film we determined {Re} χ^{(3)} = +(6.6 ± 2.4) ×10-10 esu and {Im} χ^{(3)} = +(2.2 ± 0.4) ×10-10 esu.

  9. Ultra-thin solid oxide fuel cells: Materials and devices

    Science.gov (United States)

    Kerman, Kian

    Solid oxide fuel cells are electrochemical energy conversion devices utilizing solid electrolytes transporting O2- that typically operate in the 800 -- 1000 °C temperature range due to the large activation barrier for ionic transport. Reducing electrolyte thickness or increasing ionic conductivity can enable lower temperature operation for both stationary and portable applications. This thesis is focused on the fabrication of free standing ultrathin (machining processes, respectively. Fuel cell devices integrating these membranes with metallic electrodes are demonstrated to operate in the 300 -- 500 °C range, exhibiting record performance at such temperatures. A model combining physical transport of electronic carriers in an insulating film and electrochemical aspects of transport is developed to determine the limits of performance enhancement expected via electrolyte thickness reduction. Free standing oxide heterostructures, i.e. electrolyte membrane and oxide electrodes, are demonstrated. Lastly, using Y2O3-doped ZrO2 and Gd2O 3-doped CeO2, novel electrolyte fabrication schemes are explored to develop oxide alloys and nanoscale compositionally graded membranes that are thermomechanically robust and provide added interfacial functionality. The work in this thesis advances experimental state-of-the-art with respect to solid oxide fuel cell operation temperature, provides fundamental boundaries expected for ultrathin electrolytes, develops the ability to integrate highly dissimilar material (such as oxide-polymer) heterostructures, and introduces nanoscale compositionally graded electrolyte membranes that can lead to monolithic materials having multiple functionalities.

  10. Compositional analysis of silicon oxide/silicon nitride thin films

    Directory of Open Access Journals (Sweden)

    Meziani Samir

    2016-06-01

    Full Text Available Hydrogen, amorphous silicon nitride (SiNx:H abbreviated SiNx films were grown on multicrystalline silicon (mc-Si substrate by plasma enhanced chemical vapour deposition (PECVD in parallel configuration using NH3/SiH4 gas mixtures. The mc-Si wafers were taken from the same column of Si cast ingot. After the deposition process, the layers were oxidized (thermal oxidation in dry oxygen ambient environment at 950 °C to get oxide/nitride (ON structure. Secondary ion mass spectroscopy (SIMS, Rutherford backscattering spectroscopy (RBS, Auger electron spectroscopy (AES and energy dispersive X-ray analysis (EDX were employed for analyzing quantitatively the chemical composition and stoichiometry in the oxide-nitride stacked films. The effect of annealing temperature on the chemical composition of ON structure has been investigated. Some species, O, N, Si were redistributed in this structure during the thermal oxidation of SiNx. Indeed, oxygen diffused to the nitride layer into Si2O2N during dry oxidation.

  11. High performance In2O3 thin film transistors using chemically derived aluminum oxide dielectric

    KAUST Repository

    Nayak, Pradipta K.

    2013-07-18

    We report high performance solution-deposited indium oxide thin film transistors with field-effect mobility of 127 cm2/Vs and an Ion/Ioff ratio of 106. This excellent performance is achieved by controlling the hydroxyl group content in chemically derived aluminum oxide (AlOx) thin-film dielectrics. The AlOx films annealed in the temperature range of 250–350 °C showed higher amount of Al-OH groups compared to the films annealed at 500 °C, and correspondingly higher mobility. It is proposed that the presence of Al-OH groups at the AlOx surface facilitates unintentional Al-doping and efficient oxidation of the indium oxide channel layer, leading to improved device performance.

  12. Properties and structure of oxide layers on thin coating of titanium alloy

    Directory of Open Access Journals (Sweden)

    Jan Krčil

    2015-12-01

    Full Text Available Present work discusses issues of growth and characterization of a thin oxide layer formed on the surface of a titanium-niobium alloy. An oxide layer on the surface of titanium alloys introduces a corrosion resistance and also a bio-compatibility, which is required for a medical application. Although this oxide layer is a result of a spontaneous passivation, for the practical applications it is necessary to control the growth of oxides. In this work the oxide layer was formed on the PVD coating from Ti39Nb alloy which was sputtered on three different base materials: CP Ti grade 2, stainless steel AISI 316LVM and titanium alloy Ti–6Al–4V ELI. The oxide layer was created by a thermal oxidation at 600 °C for three different oxidation periods: 1, 4 and 8 hours. After the oxidation process the influence of oxidation characteristics and base materials on the thickness and properties of oxide layer was studied. There was observed a change of color and surface roughness. The oxide layer surface as well as the layer thickness was observed by SEM. The influence of the substrate material under the coating on the oxide layer should be more investigated in the future.

  13. Hybrid dextran-iron oxide thin films deposited by laser techniques for biomedical applications

    OpenAIRE

    Predoi, Daniela; Ciobanu, Carmen Steluta; Mihaela RADU; Costache, Marieta; Dinischiotu, Anca; Gyorgy, Eniko

    2012-01-01

    Iron oxide nanoparticles were prepared by chemical co-precipitation method. The nanoparticles were mixed with dextran in distilled water. The obtained solutions were frozen in liquid nitrogen and used as targets during matrix assisted pulsed laser evaporation for the growth of hybrid, iron oxide nanoparticles-dextran thin films. Fourier Transform Infrared Spectroscopy and X-ray diffraction investigations revealed that the obtained films preserve the structure and composition of the initial, n...

  14. Synthesis of Cobalt Oxides Thin Films Fractal Structures by Laser Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    P. Haniam

    2014-01-01

    Full Text Available Thin films of cobalt oxides (CoO and Co3O4 fractal structures have been synthesized by using laser chemical vapor deposition at room temperature and atmospheric pressure. Various factors which affect the density and crystallization of cobalt oxides fractal shapes have been examined. We show that the fractal structures can be described by diffusion-limited aggregation model and discuss a new possibility to control the fractal structures.

  15. Study of thin oxide films by electron, ion and synchrotron radiation beams

    CERN Document Server

    Sammelselg, V; Tarre, A; Asari, J; Rauhala, E; Arstila, K; Seppaelae, A; Zakharov, A; Aarik, J; Karlis, J; Martinson, Indrek

    2002-01-01

    Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterized using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. lt was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures. (author)

  16. Influence of thin fluoropolymer film deposition on wettability of the silicon oxide nanowires array

    Directory of Open Access Journals (Sweden)

    Baranov Evgeniy

    2016-01-01

    Full Text Available In this work, we studied influence of fluoropolymer thin film deposition on wettability of the silicon oxide nanowires array. Deposition of fluoropolymer coating on the silicon oxide nanowires array changes the surface properties from hydrophilic to hydrophobic, and micro and nano scale surface roughness does not change significantly. In addition, it was shown that the deposition of fluoropolymer coating on nanowires protects the nanostructures from bundling together as a result of the attractive capillary forces that arise during evaporative drying.

  17. Study of oxidized iron thin films by non-Rutherford elastic scattering

    Energy Technology Data Exchange (ETDEWEB)

    Jimenez-Villacorta, F. [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Cantoblanco, 28049 Madrid (Spain)]. E-mail: felixjv@icmm.csic.es; Munoz-Martin, A. [Centro de Microanalisis de Materiales, Universidad Autonoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Prieto, C. [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, Cantoblanco, 28049 Madrid (Spain)

    2006-08-15

    Rutherford and non-Rutherford elastic scattering analyses have been performed to characterize oxidized iron thin films grown by sputtering. The oxygen depth profiles along the thickness of all the samples have been studied in order to unravel the oxidation process of these samples. The oxygen concentration along the film was related to the sample preparation parameters, resulting in a strong dependence of oxygen depth profile on the substrate temperature during deposition.

  18. Pulsed-laser-induced nanoscale island formation in thin metal-on-oxide films

    OpenAIRE

    Henley, SJ; Carey, JD; Silva, SRP

    2005-01-01

    he mechanisms controlling the nanostructuring of thin metal-on-oxide films by nanosecond pulsed excimer lasers are investigated. When permitted by the interfacial energetics, the breakup of the metal film into nanoscale islands is observed. A range of metals (Au, Ag, Mo, Ni, Ti, and Zn) with differing physical and thermodynamic properties, and differing tendencies for oxide formation, are investigated. The nature of the interfacial metal-substrate interaction, the thermal conductivity of the ...

  19. Optoelectronics Devices Based on Zinc Oxide Thin Films and Nanostructures

    OpenAIRE

    Chu, Sheng

    2011-01-01

    Optoelectronics devices based on ZnO thin films and nanostructures are discussed in this dissertation. A ZnO homojunction LED was demonstrated. Sb-doped p-type ZnO and Ga-doped n-type ZnO on Si (100) substrate were used for the LED device. After achieving ohmic contacts on both types of ZnO, the device showed rectifying current-voltage (I-V) characteristics. Under forward bias, the device successfully showed ultraviolet emissions. The emission properties were analyzed and the emission was con...

  20. Properties of anodic oxides grown on a hafnium–tantalum–titanium thin film library

    Directory of Open Access Journals (Sweden)

    Andrei Ionut Mardare

    2014-01-01

    Full Text Available A ternary thin film combinatorial materials library of the valve metal system Hf–Ta–Ti obtained by co-sputtering was studied. The microstructural and crystallographic analysis of the obtained compositions revealed a crystalline and textured surface, with the exception of compositions with Ta concentration above 48 at.% which are amorphous and show a flat surface. Electrochemical anodization of the composition spread thin films was used for analysing the growth of the mixed surface oxides. Oxide formation factors, obtained from the potentiodynamic anodization curves, as well as the dielectric constants and electrical resistances, obtained from electrochemical impedance spectroscopy, were mapped along two dimensions of the library using a scanning droplet cell microscope. The semiconducting properties of the anodic oxides were mapped using Mott–Schottky analysis. The degree of oxide mixing was analysed qualitatively using x-ray photoelectron spectroscopy depth profiling. A quantitative analysis of the surface oxides was performed and correlated to the as-deposited metal thin film compositions. In the concurrent transport of the three metal cations during oxide growth a clear speed order of Ti > Hf > Ta was proven.

  1. Characterization of monolayer formation on aluminum-doped zinc oxide thin films.

    Science.gov (United States)

    Rhodes, Crissy L; Lappi, Simon; Fischer, Daniel; Sambasivan, Sharadha; Genzer, Jan; Franzen, Stefan

    2008-01-15

    The optical and electronic properties of aluminum-doped zinc oxide (AZO) thin films on a glass substrate are investigated experimentally and theoretically. Optical studies with coupling in the Kretschmann configuration reveal an angle-dependent plasma frequency in the mid-IR for p-polarized radiation, suggestive of the detection of a Drude plasma frequency. These studies are complemented by oxygen depletion density functional theory studies for the calculation of the charge carrier concentration and plasma frequency for bulk AZO. In addition, we report on the optical and physical properties of thin film adlayers of n-hexadecanethiol (HDT) and n-octadecanethiol (ODT) self-assembled monolayers (SAMs) on AZO surfaces using reflectance FTIR spectroscopy, X-ray photoelectron spectroscopy (XPS), contact angle, and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy. Our characterization of the SAM deposition onto the AZO thin film reveals a range of possible applications for this conducting metal oxide.

  2. Indium oxide thin film based ammonia gas and ethanol vapour sensor

    Indian Academy of Sciences (India)

    For the fabrication of miniature heater indium tin oxide thin film was grown on special high temperature corning glass substrate by flash evaporation method. Gold was deposited on the film using thermal evaporation technique under high vacuum. The film was then annealed at 700 K for an hour. The thermocouple attached ...

  3. Growth Process Conditions of Tungsten Oxide Thin Films Using Hot-Wire Chemical Vapor Deposition

    NARCIS (Netherlands)

    Houweling, Z.S.|info:eu-repo/dai/nl/251874486; Geus, J.W.; de Jong, M.; Harks, P.P.R.M.L.; van der Werf, C.H.M.; Schropp, R.E.I.|info:eu-repo/dai/nl/072502584

    2011-01-01

    We report the growth conditions of nanostructured tungsten oxide (WO3−x) thin films using hot-wire chemical vapor deposition (HWCVD). Two tungsten filaments were resistively heated to various temperatures and exposed to an air flow at various subatmospheric pressures. The oxygen partial pressure was

  4. Gas-chromism in ultrasonic spray pyrolyzed tungsten oxide thin films

    Indian Academy of Sciences (India)

    A simple and inexpensive ultrasonic spray pyrolysis (USP) technique has been employed to deposit tungsten oxide (WO3) thin films by spraying 2.0 mM aqueous ammonium metatungstate solution onto the amorphous glass substrates kept at 250°C. The films were further annealed at 400°C for 4 h in air. X-ray diffraction ...

  5. Flexible metal-oxide thin film transistor circuits for RFID and health patches

    NARCIS (Netherlands)

    Heremans, P.; Papadopoulos, N.; Jamblinne De Meux, A. de; Nag, M.; Steudel, S.; Rockele, M.; Gelinck, G.; Tripathi, A.; Genoe, J.; Myny, K.

    2016-01-01

    We discuss in this paper the present state and future perspectives of thin-film oxide transistors for flexible electronics. The application case that we focus on is a flexible health patch containing an analog sensor interface as well as digital electronics to transmit the acquired data wirelessly

  6. Characterization of molybdenum-doped indium oxide thin films by ...

    Indian Academy of Sciences (India)

    In this research, indium oxide nanostructure undoped and doped with Mo were prepared on glass substrates using spray pyrolysis technique. Various parameters such as dopant concentration and deposition temperatures were studied. Structural properties of these films were investigated by X-ray diffraction and scanning ...

  7. The growth of thin film epitaxial oxide-metal heterostructures

    CERN Document Server

    Wang, C

    1998-01-01

    films with lowest IR emissivity are those made from the purest targets despite their having comparable roughnesses to films from lower purity targets. The lowest emissivity achieved was in the range of 1.64% to 1.72% measured at 3.8 mu m for 1.5 to 1.8 mu m thick films. Modifications to standard idealized Drude theory have been made which, in a phenomenological way, take account of imperfections in the sputtered Al film, oxidation state and roughness. in electric properties of the Nb film and the reduction in crystalline quality of the MgO layer. The reduction of transition temperature to the superconducting state, Tc, and the similarly systematic increase in the Nb lattice parameter were observed consistent with oxygen content data reported in the literature, as the Nb became heavily oxidized. Examination of the surface of clean and oxidized Nb by atomic force microscopy, and deposition of MgO in UHV onto a previously oxidized Nb surface, suggested that the decrease in crystalline quality of the MgO can be a...

  8. Fabrication of Au/graphene oxide/Ag sandwich structure thin film and its tunable energetics and tailorable optical properties

    Directory of Open Access Journals (Sweden)

    Ruijin Hong

    2017-01-01

    Full Text Available Au/graphene oxide/Ag sandwich structure thin film was fabricated. The effects of graphene oxide (GO and bimetal on the structure and optical properties of metal silver films were investigated by X-ray diffraction (XRD, optical absorption, and Raman intensity measurements, respectively. Compared to silver thin film, Au/graphene oxide/Ag sandwich structure composite thin films were observed with wider optical absorption peak and enhanced absorption intensity. The Raman signal for Rhodamine B molecules based on the Au/graphene oxide/Ag sandwich nanostructure substrate were obviously enhanced due to the bimetal layer and GO layer with tunable absorption intensity and fluorescence quenching effects.

  9. A review on the recent developments of solution processes for oxide thin film transistors

    Science.gov (United States)

    Du Ahn, Byung; Jeon, Hye-Ji; Sheng, Jiazhen; Park, Jozeph; Park, Jin-Seong

    2015-06-01

    This review article introduces the recent advances in the development of oxide semiconductor materials based on solution processes and their potential applications. In the early stage, thin film transistors based on oxide semiconductors fabricated by solution processes used to face critical problems such as high annealing temperatures (>400 °C) required to obtain reasonable film quality, and the relatively low field effect mobility (biosensors, and non-volatile memory devices. As such, further innovations in the solution process methods of oxide semiconductor devices are anticipated to allow the realization of cost effective, large area electronics in the near future.

  10. Demonstration of high-performance p-type tin oxide thin-film transistors using argon-plasma surface treatments

    Science.gov (United States)

    Bae, Sang-Dae; Kwon, Soo-Hun; Jeong, Hwan-Seok; Kwon, Hyuck-In

    2017-07-01

    In this work, we investigated the effects of low-temperature argon (Ar)-plasma surface treatments on the physical and chemical structures of p-type tin oxide thin-films and the electrical performance of p-type tin oxide thin-film transistors (TFTs). From the x-ray photoelectron spectroscopy measurement, we found that SnO was the dominant phase in the deposited tin oxide thin-film, and the Ar-plasma treatment partially transformed the tin oxide phase from SnO to SnO2 by oxidation. The resistivity of the tin oxide thin-film increased with the plasma-treatment time because of the reduced hole concentration. In addition, the root-mean-square roughness of the tin oxide thin-film decreased as the plasma-treatment time increased. The p-type oxide TFT with an Ar-plasma-treated tin oxide thin-film exhibited excellent electrical performance with a high current on-off ratio (5.2 × 106) and a low off-current (1.2 × 10-12 A), which demonstrates that the low-temperature Ar-plasma treatment is a simple and effective method for improving the electrical performance of p-type tin oxide TFTs.

  11. Thin-film solid-oxide fuel cells

    Energy Technology Data Exchange (ETDEWEB)

    Jankowski, A.F.

    1997-05-01

    Fuel cells are energy conversion devices that would save billions of dollars in fuel costs alone each year in the United States if they could be implemented today for stationary and transportation applications (1-5). There are a wide variety of fuel cells available, e.g. molten carbonate, phosphoric acid, proton exchange membrane and solid-oxide. However, solid-oxide fuel cells (SOFCS) are potentially more efficient and less expensive per kilowatt of power in comparison to other fuel cells. For transportation applications, the energy efficiency of a conventional internal combustion engine would be increased two-fold as replaced with a zero-emission SOFC. The basic unit of a SOFC consists of an anode and cathode separated by an oxygen-ion conducting, electrolyte layer. Manifolded stacks of fuel cells, with electrical interconnects, enable the transport and combination of a fuel and oxidant at elevated temperature to generate electrical current. Fuel cell development has proceeded along different paths based on the configuration of the anode-electrolyte-cathode. Various configurations include the tubular, monolithic and planar geometries. A planar geometry for the anode-electrolyte-cathode accompanied by a reduction in layer thickness offers the potential for high power density. Maximum power densities will require yet additional innovations in the assembly of fuel cell stacks with all of the manifolding stipulations for gas flow and electrical interconnects.

  12. Nonlinear optical characterization of graphite oxide thin film by open aperture Z-scan technique

    Energy Technology Data Exchange (ETDEWEB)

    Sreeja, V. G.; Reshmi, R.; Devasia, Sebin; Anila, E. I., E-mail: anilaei@gmail.com [Optolectronic and Nanomaterials Research Laboratory, Department of Physics, Union Christian College, Aluva-683 102, Kerala (India); Cheruvalathu, Ajina [International School of Photonics, CUSAT, Cochin-22 (India)

    2016-05-23

    In this paper we explore the structural characterization of graphite oxide powder prepared from graphite powder by oxidation via modified Hummers method. The nonlinear optical properties of the spin coated graphite oxide thin film is also explored by open aperture Z-Scan technique. Structural and physiochemical properties of the samples were investigated with the help of Fourier Transform Infrared Spectroscopy (FTIR) and Raman Spectroscopy (Raman).The results of FT-IR and Raman spectroscopy showed that the graphite is oxidized by strong oxidants and the oxygen atoms are introduced into the graphite layers forming C=C, O-H and –C-H groups. The synthesized sample has good crystalline nature with lesser defects. The nonlinear optical property of GO thin film was studied by open aperture Z-Scan technique using Q-switched Nd-Yag Laser at 532 nm. The Z-scan plot showed that the investigated GO thin film has saturable absorption behavior. The nonlinear absorption coefficient and saturation intensity were also estimated to explore its applications in Q switched mode locking laser systems.

  13. Spectroscopic and luminescent properties of Co2+ doped tin oxide thin films by spray pyrolysis

    Directory of Open Access Journals (Sweden)

    K. Durga Venkata Prasad

    2016-07-01

    Full Text Available The wide variety of electronic and chemical properties of metal oxides makes them exciting materials for basic research and for technological applications alike. Oxides span a wide range of electrical properties from wide band-gap insulators to metallic and superconducting. Tin oxide belongs to a class of materials called Transparent Conducting Oxides (TCO which constitutes an important component for optoelectronic applications. Co2+ doped tin oxide thin films were prepared by chemical spray pyrolysis synthesis and characterized by powder X-ray diffraction, SEM, TEM, FT-IR, optical, EPR and PL techniques to collect the information about the crystal structure, coordination/local site symmetry of doped Co2+ ions in the host lattice and the luminescent properties of the prepared sample. Powder XRD data revealed that the crystal structure belongs to tetragonal rutile phase and its lattice cell parameters are evaluated. The average crystallite size was estimated to be 26 nm. The morphology of prepared sample was analyzed by using SEM and TEM studies. Functional groups of the prepared sample were observed in the FT-IR spectrum. Optical absorption and EPR studies have shown that on doping, Co2+ ions enter in the host lattice as octahedral site symmetry. PL studies of Co2+ doped SnO2 thin films exhibit blue and yellow emission bands. CIE chromaticity coordinates were also calculated from emission spectrum of Co2+ doped SnO2 thin films.

  14. Activation of CO2 on transition metal surfaces and oxide supported metal thin films

    Science.gov (United States)

    Paul, Sujata; Buongiorno Nardelli, Marco

    2009-03-01

    Using first principles simulations based on Density Functional Theory, we have investigated the adsorption and activation properties of CO2 on a variety of transition metal surfaces and oxide supported metal thin films. We intend to focus on the chemical conversion of CO2 through heterogeneous catalysis using surfaces and interfaces where there is nanoscale control over charge density at the reactive sites. The activation of CO2 on clean metal surfaces is possible at very high temperatures and the situations changes drastically when reaction happens on oxide supported metal thin film. The chemical reactivity of the molecule on the surface depends on the charge rearrangement at the metal-alkaline earth oxide interface. We want to understand the possible catalytic systems and characterize the relevant geometrical and electronic parameters related to the reaction mechanisms, rates and yield.

  15. Comprehensive review on the development of high mobility in oxide thin film transistors

    Science.gov (United States)

    Choi, Jun Young; Lee, Sang Yeol

    2017-11-01

    Oxide materials are one of the most advanced key technology in the thin film transistors (TFTs) for the high-end of device applications. Amorphous oxide semiconductors (AOSs) have leading technique for flat panel display (FPD), active matrix organic light emitting display (AMOLED) and active matrix liquid crystal display (AMLCD) due to their excellent electrical characteristics, such as field effect mobility ( μ FE ), subthreshold swing (S.S) and threshold voltage ( V th ). Covalent semiconductor like amorphous silicon (a-Si) is attributed to the anti-bonding and bonding states of Si hybridized orbitals. However, AOSs have not grain boundary and excellent performances originated from the unique characteristics of AOS which is the direct orbital overlap between s orbitals of neighboring metal cations. High mobility oxide TFTs have gained attractive attention during the last few years and today in display industries. It is progressively developed to increase the mobility either by exploring various oxide semiconductors or by adopting new TFT structures. Mobility of oxide thin film transistor has been rapidly increased from single digit to higher than 100 cm2/V·s in a decade. In this review, we discuss on the comprehensive review on the mobility of oxide TFTs in a decade and propose bandgap engineering and novel structure to enhance the electrical characteristics of oxide TFTs.

  16. Low-Temperature UV-Assisted Fabrication of Metal Oxide Thin Film Transistor

    Science.gov (United States)

    Zhu, Shuanglin

    Solution processed metal oxide semiconductors have attracted intensive attention in the last several decades and have emerged as a promising candidate for the application of thin film transistor (TFT) due to their nature of transparency, flexibility, high mobility, simple processing technique and potential low manufacturing cost. However, metal oxide thin film fabricated by solution process usually requires a high temperature (over 300 °C), which is above the glass transition temperature of some conventional polymer substrates. In order to fabricate the flexible electronic device on polymer substrates, it is necessary to find a facile approach to lower the fabrication temperature and minimize defects in metal oxide thin film. In this thesis, the electrical properties dependency on temperature is discussed and an UV-assisted annealing method incorporating Deep ultraviolet (DUV)-decomposable additives is demonstrated, which can effectively improve electrical properties solution processed metal oxide semiconductors processed at temperature as low as 220 °C. By studying a widely used indium oxide (In2O3) TFT as a model system, it is worth noted that compared with the sample without UV treatment, the linear mobility and saturation mobility of UV-annealing sample are improved by 56% and 40% respectively. Meanwhile, the subthreshold swing is decreased by 32%, indicating UV-treated device could turn on and off more efficiently. In addition to pure In2O3 film, the similar phenomena have also been observed in indium oxide based Indium-Gallium-Zinc Oxide (IGZO) system. These finding presented in this thesis suggest that the UV assisted annealing process open a new route to fabricate high performance metal oxide semiconductors under low temperatures.

  17. Synthesis, surface tension, optical and dielectric properties of bismuth oxide thin film

    Directory of Open Access Journals (Sweden)

    Tezel Fatma Meydanerİ

    2017-03-01

    Full Text Available Bismuth oxide thin film was deposited by chemical bath deposition (CBD technique onto a glass substrate. The grain size (D, dislocation density (δ and number of crystallites per unit area (N, i.e. structural properties of the thin film were determined as 16 nm, 39.06× 10–4 line/nm2, 31.25 × 10–3 1/nm2, respectively. Optical transmittance properties of the thin film were investigated by using a UV-Vis spectrophotometer. The optical band gap (Eg for direct transitions, optical transmission (T %, reflectivity (R %, absorption, refractive index (nr, extinction coefficient (k, dielectric constant (∊ of the thin film were found to be 3.77 eV, 25.23 %, 32.25 %, 0.59, 3.62, 0.04 and 2.80, respectively. The thickness of the film was measured by AFM, and was found to be 128 nm. Contact angles of various liquids on the oxide thin film were determined by Zisman method, and surface tension was calculated to be 31.95 mN/m.

  18. Ellipsometric spectroscopy study of cobalt oxide thin films deposited by sol-gel

    Energy Technology Data Exchange (ETDEWEB)

    Barrera-Calva, E.; Martinez-Flores, J.C. [Departamento de Ingenieria de Procesos e Hidraulica, UAM ? Iztapalapa, Av. Rafael Atlixco No. 186, Col. Vicentina, Mexico DF 09340 (Mexico); Huerta, L. [Instituto de Investigacion en Materiales, Universidad Nacional Autonoma de Mexico, Mexico DF (Mexico); Avila, A.; Ortega-Lopez, M. [Depto. Ingenieria Electrica, SEES, CINVESTAV- IPN, Mexico DF 07360 (Mexico)

    2006-09-22

    Due to their unique optical properties, solar selective coatings enhance the thermal efficiency of solar photothermal converters. Hence it seems to be interesting to study the optical properties of promising materials as solar selective coatings. In an earlier work, it was demonstrated that sol-gel deposited cobalt oxide thin films possess suitable optical properties as selective coatings. In this work, cobalt oxide thin films were prepared by same technique and their optical properties were analyzed as a function of the dipping time of the substrate in the sol, using the spectroscopy ellipsometry, atomic force microscopy and X-ray photoelectron spectroscopy techniques. The optical constants (n and k) for these films, in the 200-800nm range, are reported as a function of the dipping time. The fitting of ellipsometric data, I{sub s} and I{sub c}, for the glass substrate and the cobalt oxide thin film, as modeled with the Lorentz and Tauc-Lorentz dispersion relations, indicated that the film microstructure resembles a multilayer stack with voids. From these results, the Co{sub 3}O{sub 4} and void percentages in the film were estimated. Both, thin film thickness and void/Co{sub 3}O{sub 4} percentage ratio, were determined to be strongly dependent on the immersion time. Furthermore, the total thickness of a multilayered film was found to be the sum of thickness of each individual layer. (author)

  19. Magnetoelectric hexaferrite thin film growth on oxide conductive layer for applications at low voltages

    Energy Technology Data Exchange (ETDEWEB)

    Zare, Saba, E-mail: zare.s@husky.neu.edu; Izadkhah, Hessam; Vittoria, Carmine

    2016-08-15

    Magnetoelectric (ME) M-type hexaferrite thin films were deposited on conductive oxide layer of Indium–Tin Oxide (ITO) in order to lower applied voltages to observe ME effects at room temperature. The thin film of ME hexaferrites, SrCo{sub 2}Ti{sub 2}Fe{sub 8}O{sub 19}/ITO buffer layer, were deposited on sapphire substrate using Pulsed Laser Deposition (PLD) technique. The film exhibited ME effects as confirmed by vibrating sample magnetometer (VSM) in voltages as low as 0.5 V. Without the oxide conductive layer the required voltages to observe ME effects were typically 500 V and higher. The thin films were characterized by X-ray diffractometer, scanning electron microscope, energy-dispersive spectroscopy, vibrating sample magnetometer, and ferromagnetic resonance. We measured saturation magnetization of 1064 G, and coercive field of 20 Oe for these thin films. The change rate in remanence magnetization was measured with the application of DC voltage at room temperature and it gave rise to changes in remanence in the order of 15% with the application of only 0.5 V (DC voltage). We deduced a ME coupling, α, of 5×10{sup −10} s m{sup −1} in SrCo{sub 2}Ti{sub 2}Fe{sub 8}O{sub 19} thin films. - Highlights: • Magnetoelectric (ME) hexaferrite thin films were deposited on conductive ITO. • Much lower voltage is required in order observe ME effects, as low as 0.5V. • ME films with conductive layers appear to be very promising in future IC circuitry.

  20. A liquid metal reaction environment for the room-temperature synthesis of atomically thin metal oxides

    Science.gov (United States)

    Zavabeti, Ali; Ou, Jian Zhen; Carey, Benjamin J.; Syed, Nitu; Orrell-Trigg, Rebecca; Mayes, Edwin L. H.; Xu, Chenglong; Kavehei, Omid; O’Mullane, Anthony P.; Kaner, Richard B.; Kalantar-zadeh, Kourosh; Daeneke, Torben

    2017-10-01

    Two-dimensional (2D) oxides have a wide variety of applications in electronics and other technologies. However, many oxides are not easy to synthesize as 2D materials through conventional methods. We used nontoxic eutectic gallium-based alloys as a reaction solvent and co-alloyed desired metals into the melt. On the basis of thermodynamic considerations, we predicted the composition of the self-limiting interfacial oxide. We isolated the surface oxide as a 2D layer, either on substrates or in suspension. This enabled us to produce extremely thin subnanometer layers of HfO2, Al2O3, and Gd2O3. The liquid metal–based reaction route can be used to create 2D materials that were previously inaccessible with preexisting methods. The work introduces room-temperature liquid metals as a reaction environment for the synthesis of oxide nanomaterials with low dimensionality.

  1. Heteroepitaxy of Cerium Oxide Thin Films on Cu(111

    Directory of Open Access Journals (Sweden)

    Josef Mysliveček

    2015-09-01

    Full Text Available An important part of fundamental research in catalysis is based on theoretical and modeling foundations which are closely connected with studies of single-crystalline catalyst surfaces. These so-called model catalysts are often prepared in the form of epitaxial thin films, and characterized using advanced material characterization techniques. This concept provides the fundamental understanding and the knowledge base needed to tailor the design of new heterogeneous catalysts with improved catalytic properties. The present contribution is devoted to development of a model catalyst system of CeO2 (ceria on the Cu(111 substrate. We propose ways to experimentally characterize and control important parameters of the model catalyst—the coverage of the ceria layer, the influence of the Cu substrate, and the density of surface defects on ceria, particularly the density of step edges and the density and the ordering of the oxygen vacancies. The large spectrum of controlled parameters makes ceria on Cu(111 an interesting alternative to a more common model system ceria on Ru(0001 that has served numerous catalysis studies, mainly as a support for metal clusters.

  2. Heteroepitaxy of Cerium Oxide Thin Films on Cu(111).

    Science.gov (United States)

    Mysliveček, Josef; Matolín, Vladimir; Matolínová, Iva

    2015-09-18

    An important part of fundamental research in catalysis is based on theoretical and modeling foundations which are closely connected with studies of single-crystalline catalyst surfaces. These so-called model catalysts are often prepared in the form of epitaxial thin films, and characterized using advanced material characterization techniques. This concept provides the fundamental understanding and the knowledge base needed to tailor the design of new heterogeneous catalysts with improved catalytic properties. The present contribution is devoted to development of a model catalyst system of CeO₂ (ceria) on the Cu(111) substrate. We propose ways to experimentally characterize and control important parameters of the model catalyst-the coverage of the ceria layer, the influence of the Cu substrate, and the density of surface defects on ceria, particularly the density of step edges and the density and the ordering of the oxygen vacancies. The large spectrum of controlled parameters makes ceria on Cu(111) an interesting alternative to a more common model system ceria on Ru(0001) that has served numerous catalysis studies, mainly as a support for metal clusters.

  3. Enhanced electrical properties of oxide semiconductor thin-film transistors with high conductivity thin layer insertion for the channel region

    Energy Technology Data Exchange (ETDEWEB)

    Nguyen, Cam Phu Thi; Raja, Jayapal; Kim, Sunbo; Jang, Kyungsoo; Le, Anh Huy Tuan; Lee, Youn-Jung; Yi, Junsin, E-mail: junsin@skku.edu

    2017-02-28

    Highlights: • The characteristics of thin film transistors using double active layers are examined. • Electrical characteristics have been improved for the double active layers devices. • The total trap density can be decreased by insert-ion of ultrathin ITO film. - Abstract: This study examined the performance and the stability of indium tin zinc oxide (ITZO) thin film transistors (TFTs) by inserting an ultra-thin indium tin oxide (ITO) layer at the active/insulator interface. The electrical properties of the double channel device (ITO thickness of 5 nm) were improved in comparison with the single channel ITZO or ITO devices. The TFT characteristics of the device with an ITO thickness of less than 5 nm were degraded due to the formation of an island-like morphology and the carriers scattering at the active/insulator interface. The 5 nm-thick ITO inserted ITZO TFTs (optimal condition) exhibited a superior field effect mobility (∼95 cm{sup 2}/V·s) compared with the ITZO-only TFTs (∼34 cm{sup 2}/V·s). The best characteristics of the TFT devices with double channel layer are due to the lowest surface roughness (0.14 nm) and contact angle (50.1°) that result in the highest hydrophicility, and the most effective adhesion at the surface. Furthermore, the threshold voltage shifts for the ITO/ITZO double layer device decreased to 0.80 and −2.39 V compared with 6.10 and −6.79 V (for the ITZO only device) under positive and negative bias stress, respectively. The falling rates of E{sub A} were 0.38 eV/V and 0.54 eV/V for the ITZO and ITO/ITZO bi-layer devices, respectively. The faster falling rate of the double channel devices suggests that the trap density, including interface trap and semiconductor bulk trap, can be decreased by the ion insertion of a very thin ITO film into the ITZO/SiO{sub 2} reference device. These results demonstrate that the double active layer TFT can potentially be applied to the flat panel display.

  4. A unified physical model of Seebeck coefficient in amorphous oxide semiconductor thin-film transistors

    Science.gov (United States)

    Lu, Nianduan; Li, Ling; Sun, Pengxiao; Banerjee, Writam; Liu, Ming

    2014-09-01

    A unified physical model for Seebeck coefficient was presented based on the multiple-trapping and release theory for amorphous oxide semiconductor thin-film transistors. According to the proposed model, the Seebeck coefficient is attributed to the Fermi-Dirac statistics combined with the energy dependent trap density of states and the gate-voltage dependence of the quasi-Fermi level. The simulation results show that the gate voltage, energy disorder, and temperature dependent Seebeck coefficient can be well described. The calculation also shows a good agreement with the experimental data in amorphous In-Ga-Zn-O thin-film transistor.

  5. Raman and XPS characterization of vanadium oxide thin films with temperature

    Energy Technology Data Exchange (ETDEWEB)

    Ureña-Begara, Ferran, E-mail: ferran.urena@uclouvain.be [Université catholique de Louvain, Institute of Information and Communication Technologies, Electronics and Applied Mathematics (ICTEAM), Louvain-la-Neuve (Belgium); Crunteanu, Aurelian [XLIM Research Institute, UMR 7252, CNRS/Université de Limoges, Limoges (France); Raskin, Jean-Pierre [Université catholique de Louvain, Institute of Information and Communication Technologies, Electronics and Applied Mathematics (ICTEAM), Louvain-la-Neuve (Belgium)

    2017-05-01

    Highlights: • Comprehensive study of the oxidation of VO{sub 2} thin films from R.T. up to 550 °C. • Phase changes and mixed-valence vanadium oxides formed during the oxidation process. • Reported Raman and XPS signatures for each vanadium oxide. • Monitoring of the current and resistance evolution at the surface of the films. • Oxidation model describing the evolution of the vanadium oxides and phase changes. - Abstract: The oxidation mechanisms and the numerous phase transitions undergone by VO{sub 2} thin films deposited on SiO{sub 2}/Si and Al{sub 2}O{sub 3} substrates when heated from room temperature (R.T.) up to 550 °C in air are investigated by Raman and X-ray photoelectron spectroscopy. The results show that the films undergo several intermediate phase transitions between the initial VO{sub 2} monoclinic phase at R.T. and the final V{sub 2}O{sub 5} phase at 550 °C. The information about these intermediate phase transitions is scarce and their identification is important since they are often found during the synthesis of vanadium dioxide films. Significant changes in the film conductivity have also been observed to occur associated to the phase transitions. In this work, current and resistance measurements performed on the surface of the films are implemented in parallel with the Raman measurements to correlate the different phases with the conductivity of the films. A model to explain the oxidation mechanisms and phenomena occurring during the oxidation of the films is proposed. Peak frequencies, full-width half-maxima, binding energies and oxidation states from the Raman and X-ray photoelectron spectroscopy experiments are reported and analyzed for all the phases encountered in VO{sub 2} films prepared on SiO{sub 2}/Si and Al{sub 2}O{sub 3} substrates.

  6. The microstructures and electrical properties of Y-doped amorphous vanadium oxide thin films

    Science.gov (United States)

    Gu, Deen; Zhou, Xin; Guo, Rui; Wang, Zhihui; Jiang, Yadong

    2017-03-01

    One of promising approaches for further improving the sensitivity of microbolometer arrays with greatly-reduced pixel size is using the thermal-sensitive materials with higher performance. In this paper, Y-doped vanadium oxide (VOx) thin films prepared by a reactively sputtering process exhibit enhanced performance for the microbolometer application compared with frequently-applied VOx thin films. Both undoped and Y-doped VOx thin films are amorphous due to the relatively low deposition temperature. Y-doped VOx thin films exhibit smoother surface morphology than VOx due to the restrained expansion of particles during depositions. Y-doping increases the temperature coefficient of resistivity by over 20% for the doping level of 1.30 at%. The change rate of resistivity, after aging for 72 h, of thin films was reduced from about 15% for undoped VOx to 2% due to the introduction of Y. Moreover, Y-doped VOx thin films have a low 1/f noise level as VOx ones. Y-doping provides an attractive approach for preparing VOx thermal-sensitive materials with enhanced performance for microbolometers.

  7. Structure evolution of zinc oxide thin films deposited by unbalance DC magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Aryanto, Didik, E-mail: didi027@lipi.go.id [Research Center for Physics, Indonesian Institute of Sciences, Serpong 15314, Tangerang Selatan (Indonesia); Materials Research Group, Physics Department, Universitas Negeri Semarang, Gunungpati, Semarang 50229 Jawa Tengah (Indonesia); Marwoto, Putut; Sugianto [Physics Department, Faculty of Mathematics and Science, Universitas Negeri Semarang, Gunungpati, Semarang 50229 Jawa Tengah (Indonesia); Materials Research Group, Physics Department, Universitas Negeri Semarang, Gunungpati, Semarang 50229 Jawa Tengah (Indonesia); Sudiro, Toto [Research Center for Physics, Indonesian Institute of Sciences, Serpong 15314, Tangerang Selatan (Indonesia); Birowosuto, Muhammad D. [Research Center for Physics, Indonesian Institute of Sciences, Serpong 15314, Tangerang Selatan (Indonesia); CINTRA UMI CNRS/NTU/THALES 3288 Research Techno Plaza, 50 Nanyang Drive, Border X Block, level 6, 637553 (Singapore); Sulhadi [Physics Department, Faculty of Mathematics and Science, Universitas Negeri Semarang, Gunungpati, Semarang 50229 Jawa Tengah (Indonesia)

    2016-04-19

    Zinc oxide (ZnO) thin films are deposited on corning glass substrates using unbalanced DC magnetron sputtering. The effect of growth temperature on surface morphology and crystallographic orientation of ZnO thin film is studied using atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques. The surface morphology and crystallographic orientation of ZnO thin film are transformed against the increasing of growth temperature. The mean grain size of film and the surface roughness are inversely and directly proportional towards the growth temperature from room temperature to 300 °C, respectively. The smaller grain size and finer roughness of ZnO thin film are obtained at growth temperature of 400 °C. The result of AFM analysis is in good agreement with the result of XRD analysis. ZnO thin films deposited in a series of growth temperatures have hexagonal wurtzite polycrystalline structures and they exhibit transformations in the crystallographic orientation. The results in this study reveal that the growth temperature strongly influences the surface morphology and crystallographic orientation of ZnO thin film.

  8. Effect of annealing on pulse laser deposition grown copper oxide thin film

    Science.gov (United States)

    Mistry, Vaibhavi H.; Mistry, Bhaumik V.; Modi, B. P.; Joshi, U. S.

    2017-05-01

    Cuprous oxide (Cu2O) is a promising non-toxic and low cost semiconductor with potential applications in photovoltaic devices and sensor applications. Copper oxide thin films were prepared on glass substrate by pulse laser deposition. The effects of annealing on the structural, optical and electrical properties of copper oxide thin films were studied. The films were annealed in air for different temperature ranging from 200 to 450 °C. X-ray diffraction patterns reveals that the films as-deposited and annealed at 200 and 250 °C are of cuprite structure with composition Cu2O. Annealing at 300 °C and above converts these films to CuO phase. The atomic force microscopy results show that both the phase has nanocrystalline and particle size of the films is increasing with increase in annealing temperature. The conversion from Cu2O to CuO phase was confirmed by a shift in the optical band gap from 2.20 eV to 1.74 eV. The annealing conditions play a major role in the structural properties of copper oxide thin films.

  9. UV-Mediated Photochemical Treatment for Low-Temperature Oxide-Based Thin-Film Transistors.

    Science.gov (United States)

    Carlos, Emanuel; Branquinho, Rita; Kiazadeh, Asal; Barquinha, Pedro; Martins, Rodrigo; Fortunato, Elvira

    2016-11-16

    Solution processing of amorphous metal oxides has lately been used as an option to implement in flexible electronics, allowing a reduction of the associated costs and high performance. However, the research has focused more on the semiconductor layer rather than on the insulator layer, which is related to the stability and performance of the devices. This work aims to evaluate amorphous aluminum oxide thin films produced by combustion synthesis and the influence of far-ultraviolet (FUV) irradiation on the properties of the insulator on thin-film transistors (TFTs) using different semiconductors, in order to have compatibility with flexible substrates. An optimized dielectric layer was obtained for an annealing of 30 min assisted by FUV exposure. These thin films were applied in gallium-indium-zinc oxide TFTs as dielectrics showing the best results for TFTs annealed at 180 °C with FUV irradiation: good reproducibility with a subthreshold slope of 0.11 ± 0.01 V dec (-1) and a turn-on voltage of -0.12 ± 0.05 V, low operating voltage, and good stability over time. Finally, the dielectric layer was applied in solution-processed indium oxide (In2O3) TFTs at low temperature, 180 °C, with a short processing time being compatible with flexible electronic applications.

  10. Properties of Silver Nanowire/Zinc Oxide Transparent Bilayer Thin Films for Optoelectronic Applications.

    Science.gov (United States)

    You, Sslimsearom; Park, Yong Seo; Choi, Hyung Wook; Kim, Kyung Hwan

    2015-11-01

    We have investigated electrical, optical and structural properties of silver nanowire (AgNW)/zinc oxide (ZnO) transparent conductive bilayer films for optoelectronic applications. The AgNW/ZnO transparent conductive bilayer films were fabricated using spin-coating and facing target sputtering (FTS) method. The spin-coated the AgNW layer has advantages, such as low resistivity and high transmittance in visible range. However, the spin-coated AgNW layers can be oxidized by natural oxygen. Consequently, the conductivity of AgNW layer was strongly decreased. So, an oxidation prevented layer is necessary. The ZnO thin film layer on the Ag NW layer can be prevented oxidation. In addition, the peeling of spin-coated AgNW layer were prevented the deposited ZnO thin film layer. As the results, the sheet resistance and average transmittance in visible range of AgNW/ZnO transparent bilayer thin films exhibited 34.1 ohm/sq. and 83.46%.

  11. Transistor Characteristics of Zinc Oxide Active Layers at Various Zinc Acetate Dihydrate Solution Concentrations of Zinc Oxide Thin-film

    Directory of Open Access Journals (Sweden)

    H.C. You

    2015-04-01

    Full Text Available This paper presents a technique involving a sol-gel deposition method applied to the deposition of zinc oxide thin film for a transistor as a semiconductor layer. This method was used for manufacturing the essential thin films of II-VI semiconductors. Zinc oxide (ZnO bottom-gate (BG thin-film transistors (TFTs have been successfully fabricated at low temperatures. We investigated the electrical characteristics of ZnO thin-film transistors at various concentrations of ZnO solution: 0.02 M, 0.03 M, 0.04 M, and 0.05 M. All of the ZnO films exhibited a hexagonal wurtzite polycrystalline structure with (002 preferred orientation. Atomic force microscopy (AFM revealed the formation of grains or clusters as a result of the accumulation of nanoparticles, and the grain size increased with increasing solution concentration. The coated ZnO films were employed as the active channel layer in thin-film transistors, and the impact of the solution concentration on the device performance was examined. As the solution concentration was increased, the field-effect mobility increased from 1 × 10–4 cm2/V-s to 1.2 × 10–1 cm2/V-s, the threshold voltage increased from 4.8 V to 11.1 V, and the Ion/Ioff ratio increased from 104 to 106. The on-off ratio (Ion/off was found to be 106. The 0.05 M ZnO solution performed optimally.

  12. Solution-Processed Gallium–Tin-Based Oxide Semiconductors for Thin-Film Transistors

    Directory of Open Access Journals (Sweden)

    Xue Zhang

    2017-12-01

    Full Text Available We investigated the effects of gallium (Ga and tin (Sn compositions on the structural and chemical properties of Ga–Sn-mixed (Ga:Sn oxide films and the electrical properties of Ga:Sn oxide thin-film transistors (TFTs. The thermogravimetric analysis results indicate that solution-processed oxide films can be produced via thermal annealing at 500 °C. The oxygen deficiency ratio in the Ga:Sn oxide film increased from 0.18 (Ga oxide and 0.30 (Sn oxide to 0.36, while the X-ray diffraction peaks corresponding to Sn oxide significantly reduced. The Ga:Sn oxide film exhibited smaller grains compared to the nanocrystalline Sn oxide film, while the Ga oxide film exhibited an amorphous morphology. We found that the electrical properties of TFTs significantly improve by mixing Ga and Sn. Here, the optimum weight ratio of the constituents in the mixture of Ga and Sn precursor sols was determined to be 1.0:0.9 (Ga precursor sol:Sn precursor sol for application in the solution-processed Ga:Sn oxide TFTs. In addition, when the Ga(1.0:Sn(0.9 oxide film was thermally annealed at 900 °C, the field-effect mobility of the TFT was notably enhanced from 0.02 to 1.03 cm2/Vs. Therefore, the mixing concentration ratio and annealing temperature are crucial for the chemical and morphological properties of solution-processed Ga:Sn oxide films and for the TFT performance.

  13. Thin cuprous oxide films prepared by thermal oxidation of copper foils with water vapor

    Energy Technology Data Exchange (ETDEWEB)

    Liang Jianbo, E-mail: liangjienbo1980@yahoo.co.jp [Department of Frontier Materials,Nagoya Institute of Technology, Nagoya 4668555 (Japan); Kishi, Naoki; Soga, Tetsuo [Department of Frontier Materials,Nagoya Institute of Technology, Nagoya 4668555 (Japan); Jimbo, Takashi [Research Center for Nano-Device and System, Nagoya Institute of Technology, Nagoya 4668555 (Japan); Ahmed, Mohsin [Department of Frontier Materials,Nagoya Institute of Technology, Nagoya 4668555 (Japan)

    2012-01-31

    We present an improved preparation method for the growth of high quality crystals of cuprous oxide films grown by thermal oxidation of cupper foils with water vapor. This method proved to be good for preparing cuprous oxide films with high purity and large grain size. X-ray diffraction studies revealed the formation of Cu{sub 2}O films with preferred (111) orientation. The cuprous oxide diodes fabricated by the above technique have been studied using current-voltage method.

  14. Interface engineered multifunctional oxide thin films with optimized properties

    Science.gov (United States)

    Collins, Gregory Roy

    2010-06-01

    In our world today, energy has become one of the most valuable resources, in particular, renewable and clean energy sources. The research presented here represents an investigation into three separate areas of this topic. In thin film applications, the ordered structures as well as the inherent thinness of the films precludes the normal physics found in bulk materials. Characterizations of films of this type can provide information on molecular level charge transfer processes of the film layer materials since diffusive properties are minimal. With the control given by pulsed laser deposition methods, film and interface structure can be altered allowing for an examination of these effects on the materials properties. For the electrolyte and cathode materials, this equates to finding thermal and PO2 dependencies for electronic and ionic transport. For barium titanate, aside from the effects of oxygen vacancies, the interface quality between the electrodes and the ferroelectric material determines the effectiveness of energy transfer between these boundaries. That is, poor bonding characteristics or the formation of intermediate layers will introduce inconsistencies and (possibly) unwanted piezoelectric response properties of the material which could introduce parasitic dampening (resistance) of the mechanical vibrations of a piezoelectric transducer, altering its resonant characteristics. The clean reaction products and potential for high power outputs provide a strong impetus into investigations of fuel cell structures to improve their functionality. With conventional applications being dominated by high temperature (>700 °C) cells utilizing YSZ as an electrolyte medium, much gain can be made in efficiency through the lowering of cell operation temperature. The first part of my research focuses on the growth and characterization of a novel multilayered electrolyte structure consisting of alternating layers of GCO and YSZ for use in a medium temperature (400--600

  15. Elevated temperature dependent transport properties of phosphorus and arsenic doped zinc oxide thin films

    Science.gov (United States)

    Cai, B.; Nakarmi, M. L.; Oder, T. N.; McMaster, M.; Velpukonda, N.; Smith, A.

    2013-12-01

    Elevated temperature dependent Hall effect measurements were performed in a wide temperature range from 80 to 800 K to study transport properties of zinc oxide (ZnO) thin films heavily doped with phosphorus (P) and arsenic (As), and grown on sapphire substrates by RF magnetron sputtering. Double thermal activation processes in both P- and As-doped ZnO thin films with small activation energy of ˜0.04 eV and large activation energy of ˜0.8 eV were observed from variable temperature Hall effect measurements. The samples exhibited n-type conductivities throughout the temperature range. Based on photoluminescence measurements at 11 K and theoretical results, the large activation energy observed in the temperature dependent Hall effect measurement has been assigned to a deep donor level, which could be related to oxygen vacancy (VO) in the doped ZnO thin films.

  16. Fabrication of nano- and microstructures inside thin translucent cuprous oxide film upon femtosecond laser exposure

    Science.gov (United States)

    Danilov, P. A.; Zayarny, D. A.; Ionin, A. A.; Kudryashov, S. I.; Litovko, E. P.; Mel'nik, N. N.; Rudenko, A. A.; Saraeva, I. N.; Umanskaya, S. F.; Khmel'nitskii, R. A.

    2017-06-01

    Subablative exposure of tightly focused visible-range femtosecond laser pulses on a thin translucent nanocrystalline copper(I) oxide on a silica glass substrate results not only in its annealing (resolidification), but apparently also in reduction of copper ions to the metallic state via single-photon absorption and the following thermal decomposition (disproportioning). Partial or complete ablation of the film within the laser focal spot and also its subablative optically contrast modification through formation of colloidal nanoparticles or annealing (resolidification) make it possible to consider this material in the thin-film form as a novel optical platform for direct laser writing of vis-IR metasurfaces and thin-film sensing plasmonic and all-dielectric nanostructures.

  17. Microscopically crumpled indium-tin-oxide thin films as compliant electrodes with tunable transmittance

    Energy Technology Data Exchange (ETDEWEB)

    Ong, Hui-Yng [School of Mechanical and Aerospace Engineering, Nanyang Technological University, Singapore 639798 (Singapore); School of Engineering, Nanyang Polytechnic, Singapore 569830 (Singapore); Shrestha, Milan; Lau, Gih-Keong, E-mail: mgklau@ntu.edu.sg [School of Mechanical and Aerospace Engineering, Nanyang Technological University, Singapore 639798 (Singapore)

    2015-09-28

    Indium-tin-oxide (ITO) thin films are perceived to be stiff and brittle. This letter reports that crumpled ITO thin films on adhesive poly-acrylate dielectric elastomer can make compliant electrodes, sustaining compression of up to 25% × 25% equi-biaxial strain and unfolding. Its optical transmittance reduces with crumpling, but restored with unfolding. A dielectric elastomer actuator (DEA) using the 14.2% × 14.2% initially crumpled ITO thin-film electrodes is electrically activated to produce a 37% areal strain. Such electric unfolding turns the translucent DEA to be transparent, with transmittance increased from 39.14% to 52.08%. This transmittance tunability promises to make a low-cost smart privacy window.

  18. Electrical and optical properties of indium zinc oxide (IZO) thin films by continuous composition spread.

    Science.gov (United States)

    Lee, J J; Kim, J S; Yoon, S J; Cho, Y S; Choi, J W

    2013-05-01

    Indium zinc oxide (IZO) films were deposited on glass substrate at room temperature using off-axis RF sputtering-continuous composition spread (CCS) system. The full range composition of IZO films were controlled by the deposition rate and thickness profiles of In2O3 and ZnO target. The structural, electrical and optical properties of IZO thin films were measured as functions of position. IZO thin film had the lowest resistivity and highest carrier concentration at the position of 15 mm (5.02 x 10(-4) omega cm, 3.9 x 10(20)/cm3). And IZO thin film had high transmittance in visible region at measured all positions. This study has investigated to explore the new composition of IZO films using CCS system.

  19. High Mobility Thin Film Transistors Based on Amorphous Indium Zinc Tin Oxide.

    Science.gov (United States)

    Noviyana, Imas; Lestari, Annisa Dwi; Putri, Maryane; Won, Mi-Sook; Bae, Jong-Seong; Heo, Young-Woo; Lee, Hee Young

    2017-06-26

    Top-contact bottom-gate thin film transistors (TFTs) with zinc-rich indium zinc tin oxide (IZTO) active layer were prepared at room temperature by radio frequency magnetron sputtering. Sintered ceramic target was prepared and used for deposition from oxide powder mixture having the molar ratio of In2O3:ZnO:SnO2 = 2:5:1. Annealing treatment was carried out for as-deposited films at various temperatures to investigate its effect on TFT performances. It was found that annealing treatment at 350 °C for 30 min in air atmosphere yielded the best result, with the high field effect mobility value of 34 cm2/Vs and the minimum subthreshold swing value of 0.12 V/dec. All IZTO thin films were amorphous, even after annealing treatment of up to 350 °C.

  20. High Mobility Thin Film Transistors Based on Amorphous Indium Zinc Tin Oxide

    Directory of Open Access Journals (Sweden)

    Imas Noviyana

    2017-06-01

    Full Text Available Top-contact bottom-gate thin film transistors (TFTs with zinc-rich indium zinc tin oxide (IZTO active layer were prepared at room temperature by radio frequency magnetron sputtering. Sintered ceramic target was prepared and used for deposition from oxide powder mixture having the molar ratio of In2O3:ZnO:SnO2 = 2:5:1. Annealing treatment was carried out for as-deposited films at various temperatures to investigate its effect on TFT performances. It was found that annealing treatment at 350 °C for 30 min in air atmosphere yielded the best result, with the high field effect mobility value of 34 cm2/Vs and the minimum subthreshold swing value of 0.12 V/dec. All IZTO thin films were amorphous, even after annealing treatment of up to 350 °C.

  1. Pulsed laser deposition of transparent conductive oxide thin films on flexible substrates

    Science.gov (United States)

    Socol, G.; Socol, M.; Stefan, N.; Axente, E.; Popescu-Pelin, G.; Craciun, D.; Duta, L.; Mihailescu, C. N.; Mihailescu, I. N.; Stanculescu, A.; Visan, D.; Sava, V.; Galca, A. C.; Luculescu, C. R.; Craciun, V.

    2012-11-01

    The influence of target-substrate distance during pulsed laser deposition of indium zinc oxide (IZO), indium tin oxide (ITO) and aluminium-doped zinc oxide (AZO) thin films grown on polyethylene terephthalate (PET) substrates was investigated. It was found that the properties of such flexible transparent conductive oxide (TCO)/PET electrodes critically depend on this parameter. The TCO films that were deposited at distances of 6 and 8 cm exhibited an optical transmittance higher than 90% in the visible range and electrical resistivities around 5 × 10-4 Ω cm. In addition to these excellent electrical and optical characteristics the films grown at 8 cm distance were homogenous, smooth, adherent, and without cracks or any other extended defects, being suitable for opto-electronic device applications.

  2. The formation of tin oxides in thin-film Sn/C/KCl(100) structures

    Energy Technology Data Exchange (ETDEWEB)

    Yurakov, Yu. A., E-mail: ftt@phys.vsu.ru; Ryabtsev, S. V.; Chuvenkova, O. A.; Domashevskaya, E. P.; Nikitenko, A. S. [Voronezh State University (Russian Federation); Kannykin, S. V.; Kushchev, S. B., E-mail: kusheev@phis.vorstu.ru [Voronezh State Technical University (Russian Federation)

    2009-01-15

    The formation of oxides upon the thermal annealing (both in air and vacuum) of island tin films grown on a KCl(100) substrate, which was coated by a thin layer of amorphous carbon, has been investigated by transmission electron microscopy. It is established that thermal annealing at temperatures below the tin melting point (T{sub m}) does not lead to phase transitions with the formation of new crystalline oxide phases. At the same time, the films undergo structural changes: the average size of blocks in the substrate plane decreases compared to those in an as-deposited film. Thermal annealing in air at temperatures above the tin melting point leads to the formation of multiphase oxide structures and increases the average size of blocks and islands in the substrate plane. It is shown that preliminary thermal annealing in air at temperatures below T{sub m} hinders oxidation upon subsequent heat treatment.

  3. Formation of thin tungsten oxide layers: characterization and exposure to deuterium

    Science.gov (United States)

    Addab, Y.; Martin, C.; Pardanaud, C.; Khayadjian, J.; Achkasov, K.; Kogut, D.; Cartry, G.; Giacometti, G.; Cabié, M.; Gardarein, J. L.; Roubin, P.

    2016-02-01

    Thin tungsten oxide layers with thicknesses up to 250 nm have been formed on W surfaces by thermal oxidation following a parabolic growth rate. The reflectance of the layers in the IR range 2.5-16 μm has been measured showing a decrease with the layer thickness especially at low wavelengths. Raman microscopy and x-ray diffraction show a nanocrystalline WO3 monoclinic structure. Low energy deuterium plasma exposure (11 eV/D+) has been performed inducing a phase transition, a change in the sample colour and the formation of tungsten bronze (D x WO3). Implantation modifies the whole layer suggesting a deep diffusion of deuterium inside the oxide. After exposure, a deuterium release due to the oxidation of D x WO3 under ambient conditions has been evidenced showing a reversible deuterium retention.

  4. Electrical and Infrared Optical Properties of Vanadium Oxide Semiconducting Thin-Film Thermometers

    Science.gov (United States)

    Zia, Muhammad Fakhar; Abdel-Rahman, Mohamed; Alduraibi, Mohammad; Ilahi, Bouraoui; Awad, Ehab; Majzoub, Sohaib

    2017-10-01

    A synthesis method has been developed for preparation of vanadium oxide thermometer thin film for microbolometer application. The structure presented is a 95-nm thin film prepared by sputter-depositing nine alternating multilayer thin films of vanadium pentoxide (V2O5) with thickness of 15 nm and vanadium with thickness of 5 nm followed by postdeposition annealing at 300°C in nitrogen (N2) and oxygen (O2) atmospheres. The resulting vanadium oxide (V x O y ) thermometer thin films exhibited temperature coefficient of resistance (TCR) of -3.55%/°C with room-temperature resistivity of 2.68 Ω cm for structures annealed in N2 atmosphere, and TCR of -3.06%/°C with room-temperature resistivity of 0.84 Ω cm for structures annealed in O2 atmosphere. Furthermore, optical measurements of N2- and O2-annealed samples were performed by Fourier-transform infrared ellipsometry to determine their dispersion curves, refractive index ( n), and extinction coefficient ( k) at wavelength from 7000 nm to 14,000 nm. The results indicate the possibility of applying the developed materials in thermometers for microbolometers.

  5. Synthesis of zinc oxide thin films prepared by sol-gel for specific bioactivity

    Science.gov (United States)

    Adam, Tijjani; Basri, B.; Dhahi, Th. S.; Mohammed, Mohammed; Hashim, U.; Noriman, N. Z.; Dahham, Omar S.

    2017-09-01

    Zinc oxide (ZnO) thin films this device to used for many application like chemical sensor, biosensor, solar energy, etc but my project to use for bioactivity(biosensor). Zinc oxide (ZnO) thin films have been grown using sol-gel technique. Characterization was done using Scanning Electron Microscope (SEM), Energy Dispersive X-ray(EDX) and Electrical Measurement(I-V). ZnO thin film was successfully synthesized using low cost sol-gel spin coating method. The coupling of DNA probe to ZnO thin film supports modified with carboxylic acid (COOH) is certainly the best practical method to make DNA immobilization and it does not require any coupling agent which could be a source of variability during the spotting with an automatic device. So, selected this coupling procedure for further experiments. The sensor was tested with initial trial with low concentrated DNA and able to detect detection of the disease effectively. Silicon-on-insulator (SOI) wafer device with ZnO can detect at different concentration in order to valid the device capabilities for detecting development. The lowest concentration 1 µM HPV DNA probe can detect is 0.1 nM HPV target DNA.

  6. High-κ Lanthanum Zirconium Oxide Thin Film Dielectrics from Aqueous Solution Precursors.

    Science.gov (United States)

    Woods, Keenan N; Chiang, Tsung-Han; Plassmeyer, Paul N; Kast, Matthew G; Lygo, Alexander C; Grealish, Aidan K; Boettcher, Shannon W; Page, Catherine J

    2017-03-29

    Metal oxide thin films are critical components in modern electronic applications. In particular, high-κ dielectrics are of interest for reducing power consumption in metal-insulator-semiconductor (MIS) field-effect transistors. Although thin-film materials are typically produced via vacuum-based methods, solution deposition offers a scalable and cost-efficient alternative. We report an all-inorganic aqueous solution route to amorphous lanthanum zirconium oxide (La 2 Zr 2 O 7 , LZO) dielectric thin films. LZO films were spin-cast from aqueous solutions of metal nitrates and annealed at temperatures between 300 and 600 °C to produce dense, defect-free, and smooth films with subnanometer roughness. Dielectric constants of 12.2-16.4 and loss tangents MIS devices utilizing LZO as the dielectric layer (1 kHz). Leakage currents <10 -7 A cm -2 at 4 MV cm -1 were measured for samples annealed at 600 °C. The excellent surface morphology, high dielectric constants, and low leakage current densities makes these LZO dielectrics promising candidates for thin-film transistor devices.

  7. Water as origin of hysteresis in zinc tin oxide thin-film transistors.

    Science.gov (United States)

    Fakhri, M; Johann, H; Görrn, P; Riedl, T

    2012-09-26

    The hysteresis behavior of transparent zinc tin oxide (ZTO) thin film transistors (TFTs) is identified to be a result of short-term bias stress induced by the measurement. The related density of shallow defect states can be adjusted by the amount of water in the ambient. Time-resolved studies of the TFTs under varied ambient demonstrate that hysteresis can be immediately switched on and off by the adsorption and desorption of water, respectively. These findings are expected to be of general importance also for other oxide-based TFTs.

  8. Current stress induced electrical instability in transparent zinc tin oxide thin-film transistors.

    Science.gov (United States)

    Cheong, Woo-Seok; Shin, Jae-Heon; Chung, Sung Mook; Hwang, Chi-Sun; Lee, Jeong-Min; Lee, Jong-Ho

    2012-04-01

    Transparent zinc tin oxide thin-film transistors (ZTO-TFTs) [Zn:Sn = 4:1-2:1] have been fabricated so as to estimate the electrical instability under constant current stress. The relative intensity of the drain current noise power spectra density has been shown to have a typical 1/f-noise character, and it is implied that the mobility fluctuation in ZTO-TFT [Zn:Sn = 4:1] can be enhanced by a short-range ordering in amorphous Zn-Sn-oxide, causing a larger shift of the threshold voltage (deltaV(th)).

  9. Crystalline Molybdenum Oxide Thin-Films for Application as Interfacial Layers in Optoelectronic Devices

    DEFF Research Database (Denmark)

    Fernandes Cauduro, André Luis; dos Reis, Roberto; Chen, Gong

    2017-01-01

    The ability to control the interfacial properties in metal-oxide thin films through surface defect engineering is vital to fine-tune their optoelectronic properties and thus their integration in novel optoelectronic devices. This is exemplified in photovoltaic devices based on organic, inorganic...... with structural characterizations, this work addresses a novel method for tuning, and correlating, the optoelectronic properties and microstructure of device-relevant MoOx layers....

  10. Fully transparent flexible tin-doped zinc oxide thin film transistors fabricated on plastic substrate

    OpenAIRE

    Dedong Han; Yi Zhang; Yingying Cong; Wen Yu; Xing Zhang; Yi Wang

    2016-01-01

    In this work, we have successfully fabricated bottom gate fully transparent tin-doped zinc oxide thin film transistors (TZO TFTs) fabricated on flexible plastic substrate at low temperature by RF magnetron sputtering. The effect of O2/Ar gas flow ratio during channel deposition on the electrical properties of TZO TFTs was investigated, and we found that the O2/Ar gas flow ratio have a great influence on the electrical properties. TZO TFTs on flexible substrate has very nice electrical charact...

  11. Design, Fabrication and Characterization of Thin Film Structures through Oxidation Kinetics

    Science.gov (United States)

    Diaz Leon, Juan Jose

    Materials science and engineering is devoted to the understanding of the physics and chemistry of materials at the mesoscale and to applying that knowledge into real-life applications. In this work, different oxide materials and different oxidation methods are studied from a materials science point of view and for specific applications. First, the deposition of complex metal oxides is explored for solar energy concentration. This requires a number of multi-cation oxide structures such as thin-film dielectric barriers, low loss waveguides or the use of continuously graded composition oxides for antireflection coatings and light concentration. Then, oxidation via Joule heating is used for the self-alignment of a selector on top of a memristor structure on a nanovia. Simulations are used to explore the necessary voltage for the insulator-to-metal transition temperature of NbO2 using finite element analysis, followed by the fabrication and the characterization of such a device. Finally, long-term copper oxidation at room temperature and pressure is studied using optical techniques. Alternative characterization techniques are used to confirm the growth rate and phase change, and an application of copper oxide as a volatile conductive bridge is shown. All these examples show how the combination of novel simulation, fabrication and characterization techniques can be used to understand physical mechanisms and enable disruptive technologies in fields such as solar cells, light emitting diodes, photodetectors or memory devices.

  12. Difference in charge transport properties of Ni-Nb thin films with native and artificial oxide

    Energy Technology Data Exchange (ETDEWEB)

    Trifonov, A. S., E-mail: trifonov.artem@phys.msu.ru [Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, 1(2), Leninskie Gory, GSP-1, Moscow 119991 (Russian Federation); Physics Faculty, Lomonosov Moscow State University, Moscow 119991 (Russian Federation); Lubenchenko, A. V. [Department of General Physics and Nuclear Fusion, National Research University ' Moscow Power Engineering Institute,' Moscow 111250 (Russian Federation); Polkin, V. I. [National University of Science and Technology “MISiS,” Moscow 119049 (Russian Federation); Pavolotsky, A. B. [Chalmers University of Technology, Göteborg 41296 (Sweden); Ketov, S. V.; Louzguine-Luzgin, D. V. [WPI Advanced Institute for Materials Research, Tohoku University, Sendai 980-8577 (Japan)

    2015-03-28

    Here, we report on the properties of native and artificial oxide amorphous thin film on a surface of an amorphous Ni-Nb sample. Careful measurements of local current-voltage characteristics of the system Ni-Nb / NiNb oxide/Pt, were carried out in contact mode of an atomic force microscope. Native oxide showed n-type conductivity, while in the artificial one exhibited p-type one. The shape of current-voltage characteristic curves is unique in both cases and no analogical behavior is found in the literature. X-ray photoelectron spectroscopy (XPS) measurements were used to detect chemical composition of the oxide films and the oxidation state of the alloy components. Detailed analysis of the XPS data revealed that the structure of natural Ni-Nb oxide film consists of Ni-NbO{sub x} top layer and nickel enriched bottom layer which provides n-type conductivity. In contrast, in the artificial oxide film Nb is oxidized completely to Nb{sub 2}O{sub 5}, Ni atoms migrate into bulk Ni-Nb matrix. Electron depletion layer is formed at the Ni-Nb/Nb{sub 2}O{sub 5} interface providing p-type conductivity.

  13. An improved substrate current model for ultra-thin gate oxide MOSFETs

    Science.gov (United States)

    Yang, Lin-An; Hao, Yue; Yu, Chun-Li; Han, Feng-Yan

    2006-03-01

    In existing substrate current Isub models for short channel MOSFETs, the new model of the characteristic ionization length l or the velocity saturation region length Ld has been developed by using the polynomial fitting method in order to represent the variation of maximum electric field Em with bias voltages in channel. This work proposes a bias-voltage- and gate-length-dependent parameter η which was previously treated as a process-dependent constant, aimed at obtaining an accurate expression of Em to increase the accuracy of Isub model for ultra-deep submicron devices with ultra-thin gate oxides. This new method overcomes the complicated modeling of characteristic ionization length l, and avoids the extractions of different fitting constant η corresponding to different devices. It also warrants the unique extraction of impact ionization coefficients Ai and Bi. Compared with some existing Isub models, the improved one presents more excellent agreements with the experiments of ultra-thin gate oxide ( tox = 1.24 nm) LDD NMOSFETs on 90 nm CMOS technology, especially in the high electric field region. Meanwhile, the new Isub model accurately simulates the shift of the peak of substrate current along the gate bias axis with the shortening of gate length which usually occurs in ultra-thin gate oxide devices, helpful to the lifetime prediction of sub-100 nm devices.

  14. Compositional influence on the electrical performance of zinc indium tin oxide transparent thin-film transistors

    Energy Technology Data Exchange (ETDEWEB)

    Marsal, A. [Dept Enginyeria Electronica and Center of Research in Nanoengineering, Universitat Politècnica Catalunya, Barcelona (Spain); Carreras, P. [Dept Física Aplicada i Òptica, Universitat de Barcelona, Barcelona (Spain); Puigdollers, J.; Voz, C.; Galindo, S.; Alcubilla, R. [Dept Enginyeria Electronica and Center of Research in Nanoengineering, Universitat Politècnica Catalunya, Barcelona (Spain); Bertomeu, J. [Dept Física Aplicada i Òptica, Universitat de Barcelona, Barcelona (Spain); Antony, A. [Dept Física Aplicada i Òptica, Universitat de Barcelona, Barcelona (Spain); Indian Institute of Technology, Bombay (India)

    2014-03-31

    In this work, zinc indium tin oxide layers with different compositions are used as the active layer of thin film transistors. This multicomponent transparent conductive oxide is gaining great interest due to its reduced content of the scarce indium element. Experimental data indicate that the incorporation of zinc promotes the creation of oxygen vacancies, which results in a higher free carrier density. In thin-film transistors this effect leads to a higher off current and threshold voltage values. The field-effect mobility is also strongly degraded, probably due to coulomb scattering by ionized defects. A post deposition annealing in air reduces the density of oxygen vacancies and improves the field-effect mobility by orders of magnitude. Finally, the electrical characteristics of the fabricated thin-film transistors have been analyzed to estimate the density of states in the gap of the active layers. These measurements reveal a clear peak located at 0.3 eV from the conduction band edge that could be attributed to oxygen vacancies. - Highlights: • Zinc promotes the creation of oxygen vacancies in zinc indium tin oxide transistors. • Post deposition annealing in air reduces the density of oxygen. • Density of states reveals a clear peak located at 0.3 eV from the conduction band.

  15. Tuning the magnetism of epitaxial cobalt oxide thin films by electron beam irradiation

    Science.gov (United States)

    Lan, Q. Q.; Zhang, X. J.; Shen, X.; Yang, H. W.; Zhang, H. R.; Guan, X. X.; Wang, W.; Yao, Y.; Wang, Y. G.; Peng, Y.; Liu, B. G.; Sun, J. R.; Yu, R. C.

    2017-07-01

    Tuning magnetic properties of perovskite thin films is a central topic of recent studies because of its fundamental significance. In this work, we demonstrated the modification of the magnetism of L a0.9C a0.1Co O3 (LCCO) thin films by introducing a stripelike superstructure in a controllable manner using electron beam irradiation (EBI) in a transmission electron microscope. The microstructure, electronic structure, strain change, and origin of magnetism of the LCCO thin films were studied in detail using aberration-corrected scanning transmission electron microscopy, electron energy loss spectroscopy, and ab initio calculations based on density functional theory. The results indicate that the EBI-induced unit cell volume expansion accompanies the formation of oxygen vacancies and leads to the spin state transition of Co ions. The low spin state of C o4 + ions depress the stripelike superstructure, while higher spin states of Co ions with lower valences are conductive to the formation of "dark stripes". Our work clarifies the origin of magnetism of epitaxial LCCO thin films, benefiting a comprehensive understanding of correlated physics in cobalt oxide thin films.

  16. Synthesis and Characterization of Potentiostatically Electrodeposited Tungsten Oxide Thin Films for Smart Window Application

    Science.gov (United States)

    More, A. J.; Patil, R. S.; Dalavi, D. S.; Suryawanshi, M. P.; Burungale, V. V.; Kim, J. H.; Patil, P. S.

    2017-02-01

    Tungsten oxide (WO3) thin films have been synthesized using electrodeposition in potentiostatic mode and the effect of different deposition potentials on their structural, morphological, optical, and electrochromic (EC) properties investigated. The deposition potential versus saturated calomel electrode (SCE) was varied from -0.35 V to -0.50 V in steps of -0.05 V for 20 min each. The electrodeposited WO3 thin films were characterized using x-ray diffraction analysis, micro-Raman spectroscopy, field-emission scanning electron microscopy, and ultraviolet-visible (UV-Vis) spectrophotometry, revealing amorphous nature with nanograins having average size from 40 nm to 60 nm. The EC performance of the WO3 thin films exhibited response times of 1.35 s for bleaching ( t b) and 3.1 s for coloration ( t c) with excellent reversibility of 64.36%. The highest coloration efficiency of the electrodeposited WO3 thin films was found to be 87.95 cm2/C. The electrochemical reversibility and stability of the WO3 thin films obtained in this study make them promising for use in smart window applications.

  17. Surface analysis of topmost layer of epitaxial layered oxide thin film: Application to delafossite oxide for oxygen evolution reaction

    Science.gov (United States)

    Toyoda, Kenji; Adachi, Hideaki; Miyata, Nobuhiro; Hinogami, Reiko; Orikasa, Yuki; Uchimoto, Yoshiharu

    2018-02-01

    Delafossite oxides (ABO2) have a layered structure with alternating layers of A and B elements, the topmost layer of which appears to determine their performance, such as the oxygen evolution reaction (OER) activity. In this study, we investigated the topmost layer of single-domain (0 0 1)-oriented AgCoO2 epitaxial thin film for potential use as an OER catalyst. The thin film was confirmed to possess OER activity at a level comparable to the catalyst in powder form. Atomic scattering spectroscopy revealed the topmost layer to be composed of CoO6 octahedra. In situ X-ray absorption spectroscopy showed that the oxidation of Co at the surface did not change under different potentials, which suggests that there is no valence fluctuation of Co in the stable CoO6 octahedral structure. However, the oxidation number of Co at the surface was lower than that in the bulk. Our density functional theoretical calculations also showed the Co atoms at the surface to have a slightly higher electron occupancy than those in the bulk, and suggests that the unoccupied t2g states of Co at the surface have an influence on OER activity.

  18. Fluorine and oxygen plasma influence on nanoparticle formation and aggregation in metal oxide thin film transistors

    Science.gov (United States)

    MÄ dzik, Mateusz; Elamurugu, Elangovan; Viegas, Jaime

    2017-03-01

    Despite recent advances in metal oxide thin-film transistor technology, there are no foundry processes available yet for large-scale deployment of metal oxide electronics and photonics, in a similar way as found for silicon based electronics and photonics. One of the biggest challenges of the metal oxide platform is the stability of the fabricated devices. Also, there is wide dispersion on the measured specifications of fabricated TFT, from lot-to-lot and from different research groups. This can be partially explained by the importance of the deposition method and its parameters, which determine thin film microstructure and thus its electrical properties. Furthermore, substrate pretreatment is an important factor, as it may act as a template for material growth. Not so often mentioned, plasma processes can also affect the morphology of deposited films on further deposition steps, such as inducing nanoparticle formation, which strongly impact the conduction mechanism in the channel layer of the TFT. In this study, molybdenum doped indium oxide is sputtered onto ALD deposited HfO2 with or without pattering, and etched by RIE chlorine based processing. Nanoparticle formation is observed when photoresist is removed by oxygen plasma ashing. HfO2 etching in CF4/Ar plasma prior to resist stripping in oxygen plasma promotes the aggregation of nanoparticles into nanosized branched structures. Such nanostructuring is absent when oxygen plasma steps are replaced by chemical wet processing with acetone. Finally, in order to understand the electronic transport effect of the nanoparticles on metal oxide thin film transistors, TFT have been fabricated and electrically characterized.

  19. Growth of ultra-thin SiO2 by laser-induced oxidation

    Science.gov (United States)

    Kailath, Binsu J.; Das Gupta, Amitava; Das Gupta, Nandita; Singh, B. N.; Kukreja, L. M.

    2009-10-01

    Pulsed laser-induced oxidation (LIO) has been suggested as an emerging technique to grow SiO2 at room temperature. LIO of silicon in a mixture of oxygen and nitrogen under different proportions has been studied in detail. The effect of the partial pressure of oxygen and nitrogen gases on the quality as well as the thickness of the oxide grown has been studied. Also, the oxidation has been carried out in the presence of dc discharge inside the growth chamber and its effect on the oxide properties has been discussed. Higher values of ramped breakdown field strength, characteristic life-time and lower leakage current have been obtained for oxide grown in the presence of dc discharge. However, LIO without dc discharge offers a significant advantage in terms of the thickness of the oxide grown. The optimized LIO process has been used to grow ultra-thin (<1 nm) oxide on silicon with good control and the electrical characteristics of the resulting MIS structure have been studied in detail.

  20. Surfactant-mediated growth of nanostructured zinc oxide thin films via electrodeposition and their photoelectrochemical performance.

    Science.gov (United States)

    Inamdar, A I; Mujawar, S H; Ganesan, V; Patil, P S

    2008-08-13

    Zinc oxide (ZnO) thin films were electrodeposited from an aqueous zinc acetate solution onto fluorine-doped thin oxide (FTO) coated conducting glass substrates. The effect of organic surfactants like polyvinyl pyrrolidone (PVP), sodium dodecyl sulfate (SDS), polyethylene glycol (PEG), ethylene glycol (EG) and polyvinyl alcohol (PVA) on their structural, morphological, optical and photoelectrochemical properties was studied. The x-ray diffraction patterns revealed the formation of phase-pure ZnO thin films. The films deposited using organic surfactants exhibit different surface morphologies. It was observed that the organic surfactants play important roles in modifying the surface morphology and size of the crystallites. A compact granular morphology was observed for the ZnO samples grown without organic surfactants. The films exhibit nanoparticles of size 100-150 nm for PVP, EG and PVA mediated growth. The vertically aligned thin and compact hexagonal crystallites stem from the SDS, whereas microporous corrugated morphology is observed for PEG-mediated growth. All the samples exhibit room temperature photoluminescence (PL). Oxygen vacancies contribute to the active luminescent centers for the emission of green light in ZnO thin films. PL gets quenched for the SDS surfactant. All the samples were post-treated with ethanol to remove stray surfactant molecules. FTIR study was used to confirm the removal of adsorbed surfactant molecules from the samples. Moreover the samples are photoelectrochemically (PEC) active and exhibit the highest photocurrent of 231 µA, a photovoltage of 492 mV and 0.42 fill factor for the ZnO:SDS films.

  1. Pulsed laser deposition of transparent conductive oxide thin films on flexible substrates

    Energy Technology Data Exchange (ETDEWEB)

    Socol, G., E-mail: gabriel.socol@inflpr.ro [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov (Romania); Socol, M. [National Institute for Materials Physics, Magurele, Ilfov (Romania); Stefan, N.; Axente, E.; Popescu-Pelin, G.; Craciun, D.; Duta, L.; Mihailescu, C.N.; Mihailescu, I.N. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov (Romania); Stanculescu, A. [National Institute for Materials Physics, Magurele, Ilfov (Romania); Visan, D.; Sava, V. [University of Bucharest, Faculty of Physics, 405 Atomistilor Str., Magurele, Ilfov (Romania); Galca, A.C. [National Institute for Materials Physics, Magurele, Ilfov (Romania); Luculescu, C.R. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov (Romania); Craciun, V. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov (Romania); Major Analytical Instrumentation Center, University of Florida, Gainesville (United States)

    2012-11-01

    Highlights: Black-Right-Pointing-Pointer TCO thin films were grown by PLD on PET substrate at low temperature. Black-Right-Pointing-Pointer We found that the quality of TCO on PET substrate depends on the target-substrate distance. Black-Right-Pointing-Pointer TCO with high transparency (>95%) and reduced electrical resistivity ({approx}5 Multiplication-Sign 10{sup -4} {Omega} cm) were obtained. Black-Right-Pointing-Pointer Optimized TCO films deposited on PET were free of any cracks. - Abstract: The influence of target-substrate distance during pulsed laser deposition of indium zinc oxide (IZO), indium tin oxide (ITO) and aluminium-doped zinc oxide (AZO) thin films grown on polyethylene terephthalate (PET) substrates was investigated. It was found that the properties of such flexible transparent conductive oxide (TCO)/PET electrodes critically depend on this parameter. The TCO films that were deposited at distances of 6 and 8 cm exhibited an optical transmittance higher than 90% in the visible range and electrical resistivities around 5 Multiplication-Sign 10{sup -4} {Omega} cm. In addition to these excellent electrical and optical characteristics the films grown at 8 cm distance were homogenous, smooth, adherent, and without cracks or any other extended defects, being suitable for opto-electronic device applications.

  2. Thermal oxidation of Ni films for p-type thin-film transistors

    KAUST Repository

    Jiang, Jie

    2013-01-01

    p-Type nanocrystal NiO-based thin-film transistors (TFTs) are fabricated by simply oxidizing thin Ni films at temperatures as low as 400 °C. The highest field-effect mobility in a linear region and the current on-off ratio are found to be 5.2 cm2 V-1 s-1 and 2.2 × 103, respectively. X-ray diffraction, transmission electron microscopy and electrical performances of the TFTs with "top contact" and "bottom contact" channels suggest that the upper parts of the Ni films are clearly oxidized. In contrast, the lower parts in contact with the gate dielectric are partially oxidized to form a quasi-discontinuous Ni layer, which does not fully shield the gate electric field, but still conduct the source and drain current. This simple method for producing p-type TFTs may be promising for the next-generation oxide-based electronic applications. © 2013 the Owner Societies.

  3. Electrochemical Water Oxidation by a Catalyst-Modified Metal-Organic Framework Thin Film

    Energy Technology Data Exchange (ETDEWEB)

    Lin, Shaoyang; Pineda-Galvan, Yuliana; Maza, William A.; Epley, Charity C.; Zhu, Jie; Kessinger, Matthew C.; Pushkar, Yulia; Morris, Amanda J. (VP); (Purdue)

    2016-12-15

    Water oxidation, a key component in artificial photosynthesis, requires high overpotentials and exhibits slow reaction kinetics that necessitates the use of stable and efficient heterogeneous water-oxidation catalysts (WOCs). Here, we report the synthesis of UiO-67 metal–organic framework (MOF) thin films doped with [Ru(tpy)(dcbpy)OH2]2+ (tpy=2,2':6',2''-terpyridine, dcbpy=5,5'-dicarboxy-2,2'-bipyridine) on conducting surfaces and their propensity for electrochemical water oxidation. The electrocatalyst oxidized water with a turnover frequency (TOF) of (0.2±0.1) s-1 at 1.71 V versus the normal hydrogen electrode (NHE) in buffered solution (pH~7) and exhibited structural and electrochemical stability. The electroactive sites were distributed throughout the MOF thin film on the basis of scan-ratedependent voltammetry studies. This work demonstrates a promising way to immobilize large concentrations of electroactive WOCs into a highly robust MOF scaffold and paves the way for future photoelectrochemical water-splitting systems.

  4. Compositional analysis of polycrystalline hafnium oxide thin films by heavy-ion elastic recoil detection analysis

    Energy Technology Data Exchange (ETDEWEB)

    Martinez, F.L. [Departamento de Electronica y Tecnologia de Computadoras, Universidad Politecnica de Cartagena, Campus Universitario Muralla del Mar, E-30202 Cartagena (Spain)]. E-mail: Felix.Martinez@upct.es; Toledano, M. [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28025 Madrid (Spain); San Andres, E. [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28025 Madrid (Spain); Martil, I. [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28025 Madrid (Spain); Gonzalez-Diaz, G. [Departamento de Fisica Aplicada III, Universidad Complutense de Madrid, E-28025 Madrid (Spain); Bohne, W. [Hahn-Meitner-Institut Berlin, Abteilung SF-4, D-14109 Berlin (Germany); Roehrich, J. [Hahn-Meitner-Institut Berlin, Abteilung SF-4, D-14109 Berlin (Germany); Strub, E. [Hahn-Meitner-Institut Berlin, Abteilung SF-4, D-14109 Berlin (Germany)

    2006-10-25

    The composition of polycrystalline hafnium oxide thin films has been measured by heavy-ion elastic recoil detection analysis (HI-ERDA). The films were deposited by high-pressure reactive sputtering (HPRS) on silicon wafers using an oxygen plasma at pressures between 0.8 and 1.6 mbar and during deposition times between 0.5 and 3.0 h. Hydrogen was found to be the main impurity and its concentration increased with deposition pressure. The composition was always slightly oxygen-rich, which is attributed to the oxygen plasma. Additionally, an interfacial silicon oxide thin layer was detected and taken into account. The thickness of the hafnium oxide film was found to increase linearly with deposition time and to decrease exponentially with deposition pressure, whereas the thickness of the silicon oxide interfacial layer has a minimum as a function of pressure at around 1.2 mbar and increases slightly as a function of time. The measurements confirmed that this interfacial layer is formed mainly during the early stages of the deposition process.

  5. Sulfur-vanadium oxide gel composites as thin film cathodes for rechargeable lithium batteries

    Energy Technology Data Exchange (ETDEWEB)

    Mukherjee, S.P.; Gavrilov, A.B.; Skotheim, T.A.

    1998-07-01

    A class of novel electroactive cathode materials based on composites produced from elemental sulfur and vanadium oxide xerogels or aerogels has been developed as models for lithium battery applications. The use of elemental sulfur in rechargeable lithium batteries has been hindered due to certain limitations such as, very low electronic conductivity and the out-diffusion of polysulfides during the cycling process which reduces the cycling efficiency. Vanadium oxide xerogels and aerogels have certain desirable characteristic physico-chemical properties, such as, high surface areas with nono-scale interconnecting porosity, high electronic conductivity, non- or nanocrystallinity, and oxidation reduction catalytic activity. Since these properties may improve the performance of sulfur based rechargeable batteries, a family of composite cathodes containing elemental sulfur and vanadium oxide gels were produced. The performance of the composites cathodes, in thin film form, were evaluated in coin cells and AA cells with metallic lithium anodes and liquid electrolytes. The multifunctional role of vanadium oxide gels on the cell performance of the cells having composite cathodes has been qualitatively explored. Results indicate that the cathodes having xerogel composites based on vanadium oxide sol from vanadium oxide isopropoxide can be made with high sulfur content (80 wt %) and with low carbon content (5 wt %) and without any polymer binder. This shows the contribution of adhesive properties and electronic conductivity of vanadium oxide xerogels. A significant suppression of polysulfide out-diffusion is observed with appropriate processing of the composite cathodes. It is anticipated that the nanoscale interconnecting porosity of gels plays an important role in this behavior. An excellent rate capability is observed with the vanadium-oxide sulfur composite cathodes indicating the contribution of intrinsic electrochemical properties of the vanadium oxide.

  6. Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films

    Science.gov (United States)

    2012-01-01

    An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance - metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system. PMID:22221518

  7. Characterization of zinc oxide thin film for pH detector

    Science.gov (United States)

    Hashim, Uda; Fathil, M. F. M.; Arshad, M. K. Md; Gopinath, Subash C. B.; Uda, M. N. A.

    2017-03-01

    This paper presents the fabrication process of the zinc oxide thin films for using to act as pH detection by using different PH solution. Sol-gel solution technique is used for preparing zinc oxide seed solution, followed by metal oxide deposition process by using spin coater on the silicon dioxide. Silicon dioxide layer is grown on the silicon wafer, then, ZnO seed solution is deposited on the silicon layer, baked, and annealing process carried on to undergo the characterization of its surface morphology, structural and crystalline phase. Electrical characterization is showed by using PH 4, 7, and 10 is dropped on the surface of the die, in addition, APTES solution is used as linker and also as a references of the electrical characterization.

  8. Lanthanum-oxide thin films deposited by plasma-enhanced atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Eun-Joo; Ko, Myoung-Gyun; Kim, Beom-Yong; Park, Sang-Kyun; Kim, Heon-Do; Park, Jong-Wan [Hanyang University, Seoul (Korea, Republic of)

    2006-09-15

    Lanthanum oxide is suited as a gate oxide that can replace SiO{sub 2} due to its high dielectric constant with a band gap of 4.3 eV [1] and its thermal stability with silicon. In this work, La{sub 2}O{sub 3} thin films was performed on Si substrates by using plasma-enhanced atomic layer deposition with La(EtCp){sub 3} as the lanthanum precursor and O{sub 3} as the reactant gas. The fully saturated growth rate of lanthanum oxide films was 0.2 A/cycle at a plasma power of 500 W. Secondary ion mass spectrometry and Rutherford backscattering measurements detected no carbon impurity content.

  9. Metal Oxides Doped PPY-PVA Blend Thin Films Based Gas Sensor

    Directory of Open Access Journals (Sweden)

    D. B. DUPARE

    2009-02-01

    Full Text Available Synthesis of metal oxides doped polypyrrole–polyvinyl alcohol blend thin films by in situ chemical oxidative polymerization, using microwave oven on glass substrate for development of Ammonia and Trimethyl ammine hazardous gas sensor. The all experimental process carried out at room temperature(304 K. These polymer materials were characterized by Chemical analyses, spectral studies (UV-visible and IR and conductivity measurement by four –probe technique. The surface morphology as observed in the SEM image was observed to be uniformly covering the entire substrate surface. The sensor was used for different concentration (ppm of TMA and Ammonia gas investigation at room temperature (304 k. This study found to possess improved electrical, mechanical and environmental stability metal oxides doped PPY-PVA films.

  10. All-amorphous-oxide transparent, flexible thin-film transistors. Efficacy of bilayer gate dielectrics.

    Science.gov (United States)

    Liu, Jun; Buchholz, D Bruce; Hennek, Jonathan W; Chang, Robert P H; Facchetti, Antonio; Marks, Tobin J

    2010-09-01

    Optically transparent and mechanically flexible thin-film transistors (TF-TFTs) composed exclusively of amorphous metal oxide films are fabricated on plastic substrates by combining an amorphous Ta(2)O(5)/SiO(x) bilayer transparent oxide insulator (TOI) gate dielectric with an amorphous zinc-indium-tin oxide (a-ZITO) transparent oxide semiconductor (TOS) channel and a-ZITO transparent oxide conductor (TOC) electrodes. The bilayer gate dielectric is fabricated by the post-cross-linking of vapor-deposited hexachlorodisiloxane-derived films to form thin SiO(x) layers (v-SiO(x)) on amorphous Ta(2)O(5) (a-Ta(2)O(5)) films grown by ion-assisted deposition at room temperature. The a-Ta(2)O(5)/v-SiO(x) bilayer TOI dielectric integrates the large capacitance of the high dielectric constant a-Ta(2)O(5) layer with the excellent dielectric/semiconductor interfacial compatibility of the v-SiO(x) layer in a-ZITO TOS-based TF-TFTs. These all-amorphous-oxide TF-TFTs, having a channel length and width of 100 and 2000 microm, respectively, perform far better than a-Ta(2)O(5)-only devices and exhibit saturation-regime field-effect mobilities of approximately 20 cm(2)/V x s, on-currents >10(-4) A, and current on-off ratios >10(5). These TFTs operate at low voltages (approximately 4.0 V) and exhibit good visible-region optical transparency and excellent mechanical flexibility.

  11. Quantitative analysis of amorphous indium zinc oxide thin films synthesized by Combinatorial Pulsed Laser Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Axente, E.; Socol, G.; Luculescu, C.R.; Craciun, V. [National Institute for Lasers, Plasma and Radiation Physics, Laser-Surface-Plasma Interactions Laboratory, Lasers Department, Magurele-Bucharest (Romania); Beldjilali, S.A. [LP3, CNRS-Aix-Marseille University, Marseille (France); LPPMCA, USTOMB-Universite des Sciences et de la Technologie d' Oran, BP 1505, Oran (Algeria); Mercadier, L.; Hermann, J. [LP3, CNRS-Aix-Marseille University, Marseille (France); Trinca, L.M.; Galca, A.C. [National Institute of Materials Physics, Laboratory of Multifunctional Materials and Structures, Magurele-Bucharest (Romania); Pantelica, D.; Ionescu, P. [National Institute of Physics and Nuclear Engineering Horia Hulubei, Magurele-Bucharest (Romania); Becherescu, N. [Apel Laser, Bucharest (Romania)

    2014-10-15

    The use of amorphous and transparent oxides is a key for the development of new thin film transistors and displays. Recently, indium zinc oxide (IZO) was shown to exhibit high transparency in the visible range, low resistivity, and high mobility. Since the properties and the cost of these films depend on the In/(In + Zn) values, the measurement of this ratio is paramount for future developments and applications. We report on accurate analysis of the elemental composition of IZO thin films synthesized using a Combinatorial Pulsed Laser Deposition technique. The monitoring of the thin films elemental composition by Laser-Induced Breakdown Spectroscopy was chosen in view of further in situ and real-time technological developments and process control during IZO fabrication. Our analytical approach is based on plasma modeling, the recorded spectra being then compared to the spectral radiance computed for plasmas in local thermal equilibrium. The cation fractions measured were compared to values obtained by complementary measurements using energy dispersive X-ray spectroscopy and Rutherford backscattering spectrometry. Spectroscopic ellipsometry assisted the scientific discussion. A good agreement between methods was found, independently of the relative fraction of indium and zinc that varied from about 65 to 90 and 35 to 10 at%, respectively, and the measurement uncertainties associated to each analytical method. (orig.)

  12. Quantitative analysis of amorphous indium zinc oxide thin films synthesized by Combinatorial Pulsed Laser Deposition

    Science.gov (United States)

    Axente, E.; Socol, G.; Beldjilali, S. A.; Mercadier, L.; Luculescu, C. R.; Trinca, L. M.; Galca, A. C.; Pantelica, D.; Ionescu, P.; Becherescu, N.; Hermann, J.; Craciun, V.

    2014-10-01

    The use of amorphous and transparent oxides is a key for the development of new thin film transistors and displays. Recently, indium zinc oxide (IZO) was shown to exhibit high transparency in the visible range, low resistivity, and high mobility. Since the properties and the cost of these films depend on the In/(In + Zn) values, the measurement of this ratio is paramount for future developments and applications. We report on accurate analysis of the elemental composition of IZO thin films synthesized using a Combinatorial Pulsed Laser Deposition technique. The monitoring of the thin films elemental composition by Laser-Induced Breakdown Spectroscopy was chosen in view of further in situ and real-time technological developments and process control during IZO fabrication. Our analytical approach is based on plasma modeling, the recorded spectra being then compared to the spectral radiance computed for plasmas in local thermal equilibrium. The cation fractions measured were compared to values obtained by complementary measurements using energy dispersive X-ray spectroscopy and Rutherford backscattering spectrometry. Spectroscopic ellipsometry assisted the scientific discussion. A good agreement between methods was found, independently of the relative fraction of indium and zinc that varied from about 65 to 90 and 35 to 10 at%, respectively, and the measurement uncertainties associated to each analytical method.

  13. Preparation and spectroscopic analysis of zinc oxide nanorod thin films of different thicknesses

    Directory of Open Access Journals (Sweden)

    Mia Nasrul Haque

    2017-10-01

    Full Text Available Zinc oxide thin films with different thicknesses were prepared on microscopic glass slides by sol-gel spin coating method, then hydrothermal process was applied to produce zinc oxide nanorod arrays. The nanorod thin films were characterized by various spectroscopic methods of analysis. From the images of field emission scanning electron microscope (FESEM, it was observed that for the film thickness up to 200 nm the formed nanorods with wurtzite hexagonal structure were uniformly distributed over the entire surface substrate. From X-ray diffraction analysis it was revealed that the thin films had good polycrystalline nature with highly preferred c-axis orientation along (0 0 2 plane. The optical characterization done by UV-Vis spectrometer showed that all the films had high transparency of 83 % to 96 % in the visible region and sharp cut off at ultraviolet region of electromagnetic spectrum. The band gap of the films decreased as their thickness increased. Energy dispersive X-ray spectroscopy (EDS showed the presence of zinc and oxygen elements in the films and Fourier transform infrared spectroscopy (FT-IR revealed the chemical composition of ZnO in the film.

  14. Transparent solar antenna of 28 GHz using transparent conductive oxides (TCO) thin film

    Science.gov (United States)

    Ali, N. I. Mohd; Misran, N.; Mansor, M. F.; Jamlos, M. F.

    2017-05-01

    This paper presents the analysis of 28GHz solar patch antenna using the variations of transparent conductive oxides (TCO) thin film as the radiating patch. Solar antenna is basically combining the function of antenna and solar cell into one device and helps to maximize the usage of surface area. The main problem of the existing solar antenna is the radiating patch which made of nontransparent material, such as copper, shadowing the solar cell and degrades the total solar efficiency. Hence, by using the transparent conductive oxides (TCO) thin film as the radiating patch, this problem can be tackled. The TCO thin film used is varied to ITO, FTO, AgHT-4, and AgHT-8 along with glass as substrate. The simulation of the antenna executed by using Computer Simulation Technology (CST) Microwave Studio software demonstrated at 28 GHz operating frequency for 5G band applications. The performance of the transparent antennas is compared with each other and also with the nontransparent patch antenna that using Rogers RT5880 as substrate, operating at the same resonance frequency and then, the material that gives the best performance is identified.

  15. The origin of local strain in highly epitaxial oxide thin films.

    Science.gov (United States)

    Ma, Chunrui; Liu, Ming; Chen, Chonglin; Lin, Yuan; Li, Yanrong; Horwitz, J S; Jiang, Jiechao; Meletis, E I; Zhang, Qingyu

    2013-10-31

    The ability to control the microstructures and physical properties of hetero-epitaxial functional oxide thin films and artificial structures is a long-sought goal in functional materials research. Normally, only the lattice misfit between the film and the substrate is considered to govern the physical properties of the epitaxial films. In fact, the mismatch of film unit cell arrangement and the Surface-Step-Terrace (SST) dimension of the substrate, named as "SST residual matching", is another key factor that significantly influence the properties of the epitaxial film. The nature of strong local strain induced from both lattice mismatch and the SST residual matching on ferroelectric (Ba,Sr)TiO3 and ferromagnetic (La,Ca)MnO3 thin films are systematically investigated and it is demonstrated that this combined effect has a dramatic impact on the physical properties of highly epitaxial oxide thin films. A giant anomalous magnetoresistance effect (~10(10)) was achieved from the as-designed vicinal surfaces.

  16. Nitrogen-doped zinc oxide thin films biosensor for determination of uric acid.

    Science.gov (United States)

    Jindal, Kajal; Tomar, Monika; Gupta, Vinay

    2013-08-07

    Nitrogen-doped zinc oxide thin films (ZnO:N) have been realized as a potential matrix for the development of a uric acid biosensor. The correlation between the change in property of the ZnO film with N doping concentration and its biosensing response has been studied. The nitrogen dopant in a ZnO film alters its defects profile, thus improving the charge transfer characteristics and resulting in an enhanced peak oxidation current in the cyclic voltammogram in comparison to that of the pure ZnO film. The studies reveal that the bio-electrode based on the nitrogen-doped ZnO thin film matrix exhibits better sensitivity (1.1 mA mM(-1) cm(-2)) with linearity over a wide range (0.05 mM to 1.0 mM) of uric acid concentration. A comparatively low value (0.10 mM) of the Michaelis-Menten constant (Km) indicates high affinity of the immobilized uricase towards uric acid. The proposed ZnO:N thin films matrix-based uric acid-biosensor has good reproducibility, a long shelf-life (20 weeks) and high selectivity.

  17. Thin Films of Reduced Hafnium Oxide with Excess Carbon for High-Temperature Oxidation Protection

    Science.gov (United States)

    2010-02-01

    contamination; thus the higher oxygen content found by XPS is partly due to organic impurities (and, possibly, water ) that are mostly concentrated in the...International Service Award, 2007. 25 REFERENCES ’C. B. Bargeron, R. C. Benson, and A. N. Jette , "High-Temperature Diffusion of Oxygen in Oxidizing Hafnium...A. N. Jette , and T. E. Phillips, "Oxidation of Hafnium Carbide in the Temperature Range 1400 ° to 2060 °C," Journal of the American Ceramic Society

  18. The growth and evolution of thin oxide films on delta-plutonium surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Garcia Flores, Harry G [Los Alamos National Laboratory; Pugmire, David L [Los Alamos National Laboratory

    2009-01-01

    The common oxides of plutonium are the dioxide (PuO{sub 2}) and the sesquioxide (Pu{sub 2}O{sub 3}). The structure of an oxide on plutonium metal under air at room temperature is typically described as a thick PuO{sub 2} film at the gas-oxide interface with a thinner PuO{sub 2} film near the oxide-metal substrate interface. In a reducing environment, such as ultra high vacuum, the dioxide (Pu{sup 4+}; O/Pu = 2.0) readily converts to the sesquioxide (Pu{sup 3+}; O/Pu = 1.5) with time. In this work, the growth and evolution of thin plutonium oxide films is studied with x-ray photoelectron spectroscopy (XPS) under varying conditions. The results indicate that, like the dioxide, the sesquioxide is not stable on a very clean metal substrate under reducing conditions, resulting in substoichiometric films (Pu{sub 2}O{sub 3-y}). The Pu{sub 2}O{sub 3-y} films prepared exhibit a variety of stoichiometries (y = 0.2-1) as a function of preparation conditions, highlighting the fact that caution must be exercised when studying plutonium oxide surfaces under these conditions and interpreting resulting data.

  19. Local mechanical and electromechanical properties of the P(VDF-TrFE)-graphene oxide thin films

    Science.gov (United States)

    Silibin, M. V.; Bystrov, V. S.; Karpinsky, D. V.; Nasani, N.; Goncalves, G.; Gavrilin, I. M.; Solnyshkin, A. V.; Marques, P. A. A. P.; Singh, Budhendra; Bdikin, I. K.

    2017-11-01

    Recently, many organic materials, including carbon materials such as carbon nanotubes (CNTs) and graphene (single-walled carbon sheet structure) were studied in order to improve their mechanical and electrical properties. In particular, copolymers of poly (vinylidene fluoride) and poly trifluoroethylene [P(VDF-TrFE)] are promising materials, which can be used as probes, sensors, actuators, etc. Composite thin film of the copolymer P(VDF-TrFE) with graphene oxide (GO) were prepared by spin coating. The obtained films were investigated using piezoresponse force microscopy (PFM). The switching behavior, piezoelectric response, dielectric permittivity and mechanical properties of the films were found to depend on the presence of GO. For understanding the mechanism of piezoresponse evolution of the composite we used models of PVDF chain, its behavior in electrical field and computed the data for piezoelectric coefficients using HyperChem software. The summarized models of graphene oxide based on graphene layer from 96 carbon atoms C: with oxygen and OH groups and with COOH groups arranged by hydrogen were used for PVDF/Graphene oxide complex: 1) with H-side (hydrogen atom) connected from PVDF to graphene oxide, 2) with F-side (fluorine atom) connected from PVDF graphene oxide and 3) Graphene Oxide/PVDF with both sides (sandwich type). Experimental results qualitatively correlate with those obtained in the calculations.

  20. Three-terminal field effect devices utilizing thin film vanadium oxide as the channel layer

    Science.gov (United States)

    Ruzmetov, Dmitry; Gopalakrishnan, Gokul; Ko, Changhyun; Narayanamurti, Venkatesh; Ramanathan, Shriram

    2010-06-01

    Electrostatic control of the metal-insulator transition (MIT) in an oxide semiconductor could potentially impact the emerging field of oxide electronics. Vanadium dioxide (VO2) is of particular interest due to the fact that the MIT happens in the vicinity of room temperature and it is considered to exhibit the Mott transition. We present a detailed account of our experimental investigation into three-terminal field effect transistor-like devices using thin film VO2 as the channel layer. The gate is separated from the channel through an insulating gate oxide layer, enabling true probing of the field effect with minimal or no interference from large leakage currents flowing directly from the electrode. The influence of the fabrication of multiple components of the device, including the gate oxide deposition, on the VO2 film characteristics is discussed. Further, we discuss the effect of the gate voltage on the device response, point out some of the unusual characteristics including temporal dependence. A reversible unipolar modulation of the channel resistance upon the gate voltage is demonstrated for the first time in optimally engineered devices. The results presented in this work are of relevance toward interpreting gate voltage response in such oxides as well as addressing challenges in advancing gate stack processing for oxide semiconductors.

  1. Synthesis of Au microwires by selective oxidation of Au–W thin-film composition spreads

    Directory of Open Access Journals (Sweden)

    Sven Hamann, Hayo Brunken, Steffen Salomon, Robert Meyer, Alan Savan and Alfred Ludwig

    2013-01-01

    Full Text Available We report on the stress-induced growth of Au microwires out of a surrounding Au–W matrix by selective oxidation, in view of a possible application as 'micro-Velcro'. The Au wires are extruded due to the high compressive stress in the tungsten oxide formed by oxidation of elemental W. The samples were fabricated as a thin-film materials library using combinatorial sputter deposition followed by thermal oxidation. Sizes and shapes of the Au microwires were investigated as a function of the W to Au ratio. The coherence length and stress state of the Au microwires were related to their shape and plastic deformation. Depending on the composition of the Au–W precursor, the oxidized samples showed regions with differently shaped Au microwires. The Au48W52 composition yielded wires with the maximum length to diameter ratio due to the high compressive stress in the tungsten oxide matrix. The values of wire length (35 μm and diameter (2 μm achieved at the Au48W52 composition are suitable for micro-Velcro applications.

  2. Polymer-assisted deposition of co-doped zinc oxide thin films for the detection of aromatic organic compounds.

    Science.gov (United States)

    Li, Wei; Kim, Dojin

    2011-12-01

    Co-doped Zinc oxide thin films are deposited onto SiO2/Si substrate by polymer-assisted deposition method. The surface morphology, structures and chemical states of the thin films are examined by scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. The gas-sensing properties of the thin films upon exposure to aromatic organic compound vapors are also investigated. Co-doping is shown to be very effective in enhancing the response of ZnO thin film to aromatic organic compound.

  3. Investigations on MGy ionizing dose effects in thin oxides of micro-electronic devices

    Energy Technology Data Exchange (ETDEWEB)

    Gaillardin, M.; Paillet, P.; Raine, M.; Martinez, M.; Marcandella, C.; Duhamel, O.; Richard, N.; Leray, J.L. [CEA, DAM, DIF, F-91297 Arpajon (France); Goiffon, V.; Corbiere, F.; Rolando, S.; Molina, R.; Magnan, P. [ISAE, Universite de Toulouse, 10 avenue Edouard Belin, BP 54032, 31055 Toulouse Cedex 4 (France); Girard, S.; Ouerdane, Y.; Boukenter, A. [Universite de Saint-Etienne, Laboratoire H. Curien, UMR-5516, 42000, Saint-Etienne (France)

    2015-07-01

    Total ionizing dose (TID) effects have been studied for a long time in micro-electronic components designed to operate in natural and artificial environments. In most cases, TID induces both charge trapping in the bulk of irradiated oxides and the buildup of interface traps located at semiconductor/dielectric interfaces. Such effects result from basic mechanisms driven by both the shape of the electric field which stands into the oxide and by fabrication process parameters inducing pre-existing traps in the oxide's bulk. From the pioneering studies based on 'thick' oxide technologies to the most recent ones dedicated to innovative technologies, most studies concluded that the impact of total ionizing dose effects reduces with the oxide thinning. This is specifically the case for the gate-oxide of Metal-Oxide-Semiconductor Field Effect Transistors (MOSFET) for which it is generally considered that TID is not a major issue anymore at kGy dose ranges. TID effects are now mainly due to charge trapping in the field oxides such as Shallow Trench Isolation. This creates either parasitic conduction paths or Radiation-Induced Narrow Channel Effects (RINCE). Static current-voltage (I-V) electrical characteristics are then modified through a significant increase of the off-current of NMOS transistors or by shifting the whole I-V curves (of both NMOS and PMOS transistors). Based on these assumptions, no significant shift of I-V curves should be observed in modern bulk CMOS technologies. However, such phenomenon may not be directly extrapolated to higher TID ranges, typically of several MGy for which only few data are available in the literature. This paper presents evidences of large threshold voltage shifts measured at MGy dose levels despite the fact that transistors are designed in a submicron bulk technology which features a 7-nm thin gate-oxide on GO2 transistors dedicated to mixed analog/digital integrated circuits. Such electrical shifts are encountered

  4. High stability mechanisms of quinary indium gallium zinc aluminum oxide multicomponent oxide films and thin film transistors

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Ching-Ting, E-mail: ctlee@ee.ncku.edu.tw; Lin, Yung-Hao; Lin, Jhong-Ham [Institute of Microelectronics, Department of Electrical Engineering, Research Center for Energy Technology and Strategy (RCETS), National Cheng Kung University, Tainan, Taiwan (China)

    2015-01-28

    Quinary indium gallium zinc aluminum oxide (IGZAO) multicomponent oxide films were deposited using indium gallium zinc oxide (IGZO) target and Al target by radio frequency magnetron cosputtering system. An extra carrier transport pathway could be provided by the 3 s orbitals of Al cations to improve the electrical properties of the IGZO films, and the oxygen instability could be stabilized by the strong Al-O bonds in the IGZAO films. The electron concentration change and the electron mobility change of the IGZAO films for aging time of 10 days under an air environment at 40 °C and 75% humidity were 20.1% and 2.4%, respectively. The experimental results verified the performance stability of the IGZAO films. Compared with the thin film transistors (TFTs) using conventional IGZO channel layer, in conducting the stability of TFTs with IGZAO channel layer, the transconductance g{sub m} change, threshold voltage V{sub T} change, and the subthreshold swing S value change under the same aging condition were improved to 7.9%, 10.5%, and 14.8%, respectively. Furthermore, the stable performances of the IGZAO TFTs were also verified by the positive gate bias stress. In this research, the quinary IGZAO multicomponent oxide films and that applied in TFTs were the first studied in the literature.

  5. Low-voltage gallium-indium-zinc-oxide thin film transistors based logic circuits on thin plastic foil: Building blocks for radio frequency identification application

    NARCIS (Netherlands)

    Tripathi, A.K.; Smits, E.C.P.; Putten, J.B.P.H. van der; Neer, M. van; Myny, K.; Nag, M.; Steudel, S.; Vicca, P.; O'Neill, K.; Veenendaal, E. van; Genoe, G.; Heremans, P.; Gelinck, G.H.

    2011-01-01

    In this work a technology to fabricate low-voltage amorphous gallium-indium-zinc oxide thin film transistors (TFTs) based integrated circuits on 25 µm foils is presented. High performance TFTs were fabricated at low processing temperatures (<150 °C) with field effect mobility around 17 cm2 /V s. The

  6. Optical and Structural Properties of Thermally Evaporated Zinc Oxide Thin Films on Polyethylene Terephthalate Substrates

    Directory of Open Access Journals (Sweden)

    M. G. Faraj

    2011-01-01

    Full Text Available Zinc oxide thin films of different thicknesses ranging from 100 to 300 nm were prepared on polyethylene terephthalate substrates with thermal evaporation in a vacuum of approximately 3×10-5 Torr. X-ray diffraction patterns confirm the proper phase formation of the material. From atomic force microscopy (AFM images, it was found that the root mean square roughness of the film surface increased as the film thickness increased. The optical properties of ZnO on PET substrates were determined through the optical transmission method using an ultraviolet-visible spectrophotometer. The optical band gap values of ZnO thin films slightly decreased as the film thickness increased.

  7. Crack density and electrical resistance in indium-tin-oxide/polymer thin films under cyclic loading

    KAUST Repository

    Mora Cordova, Angel

    2014-11-01

    Here, we propose a damage model that describes the degradation of the material properties of indium-tin-oxide (ITO) thin films deposited on polymer substrates under cyclic loading. We base this model on our earlier tensile test model and show that the new model is suitable for cyclic loading. After calibration with experimental data, we are able to capture the stress-strain behavior and changes in electrical resistance of ITO thin films. We are also able to predict the crack density using calibrations from our previous model. Finally, we demonstrate the capabilities of our model based on simulations using material properties reported in the literature. Our model is implemented in the commercially available finite element software ABAQUS using a user subroutine UMAT.[Figure not available: see fulltext.].

  8. Modeling the transport properties of epitaxially grown thermoelectric oxide thin films using spectroscopic ellipsometry

    KAUST Repository

    Sarath Kumar, S. R.

    2012-02-01

    The influence of oxygen vacancies on the transport properties of epitaxial thermoelectric (Sr,La)TiO3 thin films is determined using electrical and spectroscopic ellipsometry (SE) measurements. Oxygen vacancy concentration was varied by ex-situ annealing in Ar and Ar/H2. All films exhibited degenerate semiconducting behavior, and electrical conductivity decreased (258–133 S cm−1) with increasing oxygen content. Similar decrease in the Seebeck coefficient is observed and attributed to a decrease in effective mass (7.8–3.2 me ), as determined by SE. Excellent agreement between transport properties deduced from SE and direct electrical measurements suggests that SE is an effective tool for studying oxide thin film thermoelectrics.

  9. The Electrical Characteristics of Aluminium Doped Zinc Oxide Thin Film for Humidity Sensor Applications

    Directory of Open Access Journals (Sweden)

    N. D. Md Sin

    2011-01-01

    Full Text Available The electrical characteristics of aluminum (Al doped zinc oxide (ZnO thin film for high sensitivity humidity sensors are presented. The effects of Al doping concentration at 0∼0.6 at % on the Al doped ZnO thin film properties were investigated using current-voltage measurement. The optical and structural properties were characterized using photoluminescence (PL, scanning emission microscope (SEM, and X-ray diffraction (XRD. Parameter 0.6 at % Aluminum doped show high sensitivity and suitable for humidity sensor. PL show an emissions band with two peaks centered at about 380 nm (ultra-violet (UV and 600 nm (green in a room temperature. The length of the nanorods increases as the doping concentration increases. XRD results show the intensity of the (002 peak decreased with the increasing of doping concentration.

  10. Morphological impact of zinc oxide layers on the device performance in thin-film transistors.

    Science.gov (United States)

    Faber, Hendrik; Klaumünzer, Martin; Voigt, Michael; Galli, Diana; Vieweg, Benito F; Peukert, Wolfgang; Spiecker, Erdmann; Halik, Marcus

    2011-03-01

    Zinc oxide thin-films are prepared either by spin coating of an ethanolic dispersion of nanoparticles (NP, diameter 5 nm) or by spray pyrolysis of a zinc acetate dihydrate precursor. High-resolution electron microscopy studies reveal a monolayer of particles for the low temperature spin coating approach and larger crystalline domains of more than 30 nm for the spray pyrolysis technique. Thin-film transistor devices (TFTs) based on spray pyrolysis films exhibit higher electron mobilities of up to 24 cm2 V(-1) s(-1) compared to 0.6 cm2 V(-1) s(-1) for NP based TFTs. These observations were dedicated to a reduced number of grain boundaries within the transistor channel.

  11. Doped nanocrystalline silicon oxide for use as (intermediate) reflecting layers in thin-film silicon solar cells

    NARCIS (Netherlands)

    Babal, P.

    2014-01-01

    In summary, this thesis shows the development and nanostructure analysis of doped silicon oxide layers. These layers are applied in thin-film silicon single and double junction solar cells. Concepts of intermediate reflectors (IR), consisting of silicon and/or zinc oxide, are applied in tandem

  12. Tungsten oxide thin films grown by thermal evaporation with high resistance to leaching

    Energy Technology Data Exchange (ETDEWEB)

    Correa, Diogo S. [Universidade Federal de Pelotas (UFPel), RS (Brazil). Centro de Ciencias Quimicas, Farmaceuticas e de Alimentos; Pazinato, Julia C.O.; Freitas, Mauricio A. de; Radtke, Claudio; Garcia, Irene T.S., E-mail: irene@iq.ufrgs.br [Universidade Federal do Rio Grande do Sul (UFRGS), Porto Alegre, RS (Brazil). Instituto de Quimica; Dorneles, Lucio S. [Universidade Federal de Santa Maria (UFSM), RS (Brazil). Centro de Ciencias Naturais e Exatas

    2014-05-15

    Tungsten oxides show different stoichiometries, crystal lattices and morphologies. These characteristics are important mainly when they are used as photocatalysts. In this work tungsten oxide thin films were obtained by thermal evaporation on (100) silicon substrates covered with gold and heated at 350 and 600 °C, with different deposition times. The stoichiometry of the films, morphology, crystal structure and resistance to leaching were characterized through X-ray photoelectron spectroscopy, micro-Raman spectroscopy, scanning and transmission electron microscopy, X-ray diffractometry, Rutherford backscattering spectrometry and O{sup 16} (α,α')O{sup 16} resonant nuclear reaction. Films obtained at higher temperatures show well-defined spherical nanometric structure; they are composed of WO{sub 3.1} and the presence of hydrated tungsten oxide was also observed. The major crystal structure observed is the hexagonal. Thin films obtained through thermal evaporation present resistance to leaching in aqueous media and excellent performance as photocatalysts, evaluated through the degradation of the methyl orange dye. (author)

  13. Optical, structural and electrochromic properties of sputter- deposited W-Mo oxide thin films

    Science.gov (United States)

    Gesheva, K.; Arvizu, M. A.; Bodurov, G.; Ivanova, T.; Niklasson, G. A.; Iliev, M.; Vlakhov, T.; Terzijska, P.; Popkirov, G.; Abrashev, M.; Boyadjiev, S.; Jágerszki, G.; Szilágyi, I. M.; Marinov, Y.

    2016-10-01

    Thin metal oxide films were investigated by a series of characterization techniques including impedance spectroscopy, spectroscopic ellipsometry, Raman spectroscopy, and Atomic Force Microscopy. Thin film deposition by reactive DC magnetron sputtering was performed at the Ångström Laboratory. W and Mo targets (5 cm diameter) and various oxygen gas flows were employed to prepare samples with different properties, whereas the gas pressure was kept constant at about 30 mTorr. The substrates were 5×5 cm2 plates of unheated glass pre-coated with ITO having a resistance of 40 ohm/sq. Film thicknesses were around 300 nm as determined by surface profilometry. Newly acquired equipment was used to study optical spectra, optoelectronic properties, and film structure. Films of WO3 and of mixed W- Mo oxide with three compositions showed coloring and bleaching under the application of a small voltage. Cyclic voltammograms were recorded with a scan rate of 5 mV s-1. Ellipsometric data for the optical constants show dependence on the amount of MoOx in the chemical composition. Single MoOx film, and the mixed one with only 8% MoOx have the highest value of refractive index, and similar dispersion in the visible spectral range. Raman spectra displayed strong lines at wavenumbers between 780 cm-1 and 950 cm-1 related to stretching vibrations of WO3, and MoO3. AFM gave evidence for domains of different composition in mixed W-Mo oxide films.

  14. Heterojunction oxide thin-film transistors with unprecedented electron mobility grown from solution

    KAUST Repository

    Faber, Hendrik

    2017-04-28

    Thin-film transistors made of solution-processed metal oxide semiconductors hold great promise for application in the emerging sector of large-area electronics. However, further advancement of the technology is hindered by limitations associated with the extrinsic electron transport properties of the often defect-prone oxides. We overcome this limitation by replacing the single-layer semiconductor channel with a low-dimensional, solution-grown In2O3/ZnO heterojunction. We find that In2O3/ZnO transistors exhibit band-like electron transport, with mobility values significantly higher than single-layer In2O3 and ZnO devices by a factor of 2 to 100. This marked improvement is shown to originate from the presence of free electrons confined on the plane of the atomically sharp heterointerface induced by the large conduction band offset between In2O3 and ZnO. Our finding underscores engineering of solution-grown metal oxide heterointerfaces as an alternative strategy to thin-film transistor development and has the potential for widespread technological applications.

  15. Temperature Dependence of the Seebeck Coefficient in Zinc Oxide Thin Films

    Science.gov (United States)

    Noori, Amirreza; Masoumi, Saeed; Hashemi, Najmeh

    2017-12-01

    Thermoelectric devices are reliable tools for converting waste heat into electricity as they last long, produce no noise or vibration, have no moving elements, and their light weight makes them suitable for the outer space usage. Materials with high thermoelectric figure of merit (zT) have the most important role in the fabrication of efficient thermoelectric devices. Metal oxide semiconductors, specially zinc oxide has recently received attention as a material suitable for sensor, optoelectronic and thermoelectric device applications because of their wide direct bandgap, chemical stability, high-energy radiation endurance, transparency and acceptable zT. Understanding the thermoelectric properties of the undoped ZnO thin films can help design better ZnO-based devices. Here, we report the results of our experimental work on the thermoelectric properties of the undoped polycrystalline ZnO thin films. These films are deposited on alumina substrates by thermal evaporation of zinc in vacuum followed by a controlled oxidation process in air carried out at the 350-500 °C temperature range. The experimental setup including gradient heaters, thermometry system and Seebeck voltage measurement equipment for high resistance samples is described. Seebeck voltage and electrical resistivity of the samples are measured at different conditions. The observed temperature dependence of the Seebeck coefficient is discussed.

  16. Magneto-optical Kerr effect studies of copper oxide and cobalt thin films

    Energy Technology Data Exchange (ETDEWEB)

    Fronk, Michael; Zahn, Dietrich R.T.; Salvan, Georgeta [Chemnitz University of Technology, Chemnitz (Germany); Mueller, Steve; Waechtler, Thomas; Schulz, Stefan E. [Fraunhofer Research Institution for Electronic Nano Systems ENAS, Chemnitz (Germany)

    2011-07-01

    Copper oxide is supposed to be a model material for tunnel-magneto-resistance (TMR) structures together with cobalt as ferromagnetic electrode. Therefore the magnetic properties of copper oxide itself are of interest and under investigation by various techniques. This contribution presents spectroscopic magneto-optical Kerr effect (MOKE) studies of thin films of this material. The films are produced by atomic layer deposition based on a Cu(I) {beta}-diketonate precursor at a process temperature of 120 C. The copper oxide films turned out to be magneto-optically active both in the spectral range around 2 eV and above 4 eV. Besides the experimental MOKE data the material-intrinsic magneto-optical Voigt constant extracted from optical model calculations are presented. Cobalt, the ferromagnetic counterpart in the TMR structures, was prepared by magnetron sputtering as thin films with different thicknesses. The Voigt constant of Co can be deduced from measurements on thick films (120 nm). It is investigated whether these data can be used to predict the magneto-optical response of thinner Co layers (10 nm).

  17. Heterojunction oxide thin-film transistors with unprecedented electron mobility grown from solution.

    Science.gov (United States)

    Faber, Hendrik; Das, Satyajit; Lin, Yen-Hung; Pliatsikas, Nikos; Zhao, Kui; Kehagias, Thomas; Dimitrakopulos, George; Amassian, Aram; Patsalas, Panos A; Anthopoulos, Thomas D

    2017-03-01

    Thin-film transistors made of solution-processed metal oxide semiconductors hold great promise for application in the emerging sector of large-area electronics. However, further advancement of the technology is hindered by limitations associated with the extrinsic electron transport properties of the often defect-prone oxides. We overcome this limitation by replacing the single-layer semiconductor channel with a low-dimensional, solution-grown In2O3/ZnO heterojunction. We find that In2O3/ZnO transistors exhibit band-like electron transport, with mobility values significantly higher than single-layer In2O3 and ZnO devices by a factor of 2 to 100. This marked improvement is shown to originate from the presence of free electrons confined on the plane of the atomically sharp heterointerface induced by the large conduction band offset between In2O3 and ZnO. Our finding underscores engineering of solution-grown metal oxide heterointerfaces as an alternative strategy to thin-film transistor development and has the potential for widespread technological applications.

  18. High rate deposition of transparent conducting oxide thin films by vacuum arc plasma evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Minami, Tadatsugu; Ida, Satoshi; Miyata, Toshihiro

    2002-09-02

    Transparent conducting oxide (TCO) thin films have been deposited at a high rate above 370 nm/min by vacuum arc plasma evaporation (VAPE) using sintered oxide fragments as the source material. It was found that the deposition rate of TCO films was strongly dependent on the deposition pressure, whereas the obtained electrical properties were relatively independent of the pressure. Resistivities of 5.6x10{sup -4} and 2.3x10{sup -4} {omega}{center_dot}cm and an average transmittance above 80% (with substrate included) in the visible range were obtained in Ga-doped ZnO (GZO) thin films deposited at 100 and 350 deg. C, respectively. In addition, a resistivity as low as 1.4x10{sup -4} {omega}{center_dot}cm and an average transmittance above 80% were also obtained in indium-tin-oxide (ITO) films deposited at 300 deg. C. The deposited TCO films exhibited uniform distributions of resistivity and thickness on large area substrates.

  19. Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Sammelselg, Väino, E-mail: vaino.sammelselg@ut.ee [Institute of Physics, University of Tartu, Riia 142, 51014 Tartu (Estonia); Institute of Chemistry, University of Tartu, Ravila 14a, 50411 Tartu (Estonia); Netšipailo, Ivan; Aidla, Aleks; Tarre, Aivar; Aarik, Lauri; Asari, Jelena; Ritslaid, Peeter; Aarik, Jaan [Institute of Physics, University of Tartu, Riia 142, 51014 Tartu (Estonia)

    2013-09-02

    Etching rate of technologically important metal oxide thin films in hot sulphuric acid was investigated. The films of Al-, Ti-, Cr-, and Ta-oxides studied were grown by atomic layer deposition (ALD) method on silicon substrates from different precursors in large ranges of growth temperatures (80–900 °C) in order to reveal process parameters that allow deposition of coatings with higher chemical resistance. The results obtained demonstrate that application of processes that yield films with lower concentration of residual impurities as well as crystallization of films in thermal ALD processes leads to significant decrease of etching rate. Crystalline films of materials studied showed etching rates down to values of < 5 pm/s. - Highlights: • Etching of atomic layer deposited thin metal oxide films in hot H{sub 2}SO{sub 4} was studied. • Smallest etching rates of < 5 pm/s for TiO{sub 2}, Al{sub 2}O{sub 3}, and Cr{sub 2}O{sub 3} were reached. • Highest etching rate of 2.8 nm/s for Al{sub 2}O{sub 3} was occurred. • Remarkable differences in etching of non- and crystalline films were observed.

  20. Tungsten oxide thin films obtained by anodisation in low electrolyte concentration

    Energy Technology Data Exchange (ETDEWEB)

    Costa, Nadja B.D. da [Centro de Ciências Químicas, Farmacêuticas e de Alimentos, Universidade Federal de Pelotas, Campus Capão do Leão, s/n, Pelotas, RS (Brazil); Pazinato, Julia C.O. [Instituto de Química, Universidade Federal do Rio Grande do Sul, Av. Bento Gonçalves, 9500 Porto Alegre, RS (Brazil); Sombrio, Guilherme; Pereira, Marcelo B.; Boudinov, Henri [Instituto de Física, Universidade Federal do Rio Grande do Sul, Av. Bento Gonçalves, 9500 Porto Alegre, RS (Brazil); Gündel, André; Moreira, Eduardo C. [Universidade Federal do Pampa, Travessa 45, 1650 Bagé, RS (Brazil); Garcia, Irene T.S., E-mail: irene.garcia@ufrgs.br [Instituto de Química, Universidade Federal do Rio Grande do Sul, Av. Bento Gonçalves, 9500 Porto Alegre, RS (Brazil)

    2015-03-02

    Tungsten oxide nanostructured films were grown on tungsten substrates by anodisation under a fixed voltage and with sodium fluoride as electrolyte. The effect of the anion chloride and the influence of the modifying agent disodium hydrogen phosphate in the tungsten oxide films were also investigated. The structural characterisation of the films was performed by scanning electron microscopy, atomic force microscopy and Raman spectroscopy. The band gap was determined through diffuse reflectance spectroscopy. The thin films were photoluminescent and emitted in the range of 300 to 630 nm when irradiated at 266 nm. The synthesised films efficiently degraded of methyl orange dye in the presence of hydrogen peroxide and 250 nm radiation. The modifying agent was responsible for the improvement of the photocatalytic activity. Films with similar photocatalytic performance were obtained when the system sodium fluoride and disodium hydrogen phosphate were replaced by sodium chloride. The porous structure and low band gap values were responsible for the photocatalytic behaviour. - Highlights: • Tungsten oxide thin films were obtained by anodisation of tungsten in aqueous media. • The performance of the NaCl, NaF and NaF/Na{sub 2}HPO{sub 4} as electrolytes was investigated. • The relation between structure and optical behaviour has been discussed. • Films obtained with NaCl and NaF/Na{sub 2}HPO{sub 4} present similar photocatalytic activity.

  1. Graphene oxide, reduced graphene oxide and composite thin films NO2 sensing properties

    Science.gov (United States)

    Dunst, Katarzyna J.; Jasiński, Piotr

    2016-11-01

    A graphene oxide (GO), reduced graphene oxide (RGO) and poly(3,4-ethylenedioxytiophene)-reduced graphene oxide (PEDOT-RGO composite) gas sensors were successfully fabricated using an electro-deposition method. The electro-deposition was carried out in aqueous GO dispersions. To obtain RGO and PEDOT-RGO, the electrochemical reduction of GO and PEDOT-GO was carried out in 0.1 M KCl at a constant potential of -0.85 V. The GO, RGO and PEDOT-RGO composite were characterized by scanning electron microscopy (SEM). The fabricated sensors showed sensitivity to NO2 gas. In this work the sensing response of GO, RGO and PEDOT-RGO in NO2 at elevated temperatures were investigated. The influence of the operating temperature on the gas sensing response were compared. The role of the polymer and RGO in PEDOT-RGO composite was discussed. The results are discussed in light of recent literature on graphene sensors.

  2. Deposition, characterization and optimization of zinc oxide thin film for piezoelectric cantilevers

    Science.gov (United States)

    Wang, Peihong; Du, Hejun; Shen, Shengnan; Zhang, Mingsheng; Liu, Bo

    2012-10-01

    In this work, piezoelectric zinc oxide (ZnO) thin films are deposited under different deposition conditions using RF magnetron sputtering method. The influence of RF power, O2/(Ar + O2) gas ratio and sputtering pressure on the deposition rate, crystalline structures, surface roughness and composition purity of ZnO film are investigated by X-ray Diffractometer (XRD), scanning electron microscopy (SEM), atom force microscopy (AFM) and energy dispersive X-ray spectroscopy (EDS). All the fabricated ZnO films have a preferred ZnO(0 0 2) orientation. When the gas ratio of O2/(Ar + O2) is 25% and the working pressure is 0.8 Pa, the grain size in the ZnO thin film is of the largest and the ZnO film has a very smooth and dense surface. The SEM cross-sectional image of the ZnO film confirms that the ZnO thin film has a columnar structure and the c-axis is perpendicular to the substrate surface. The EDS analysis shows the ZnO film has only Zn and O elements. Different ZnO film based piezoelectric micro cantilevers are fabricated using micromachining techniques and the dynamic response of these piezoelectric cantilevers are measured by laser Doppler vibrometer (LDV). The tested results from LDV show that the deflection of the piezoelectric cantilever is linear with the driving voltage. The transverse piezoelectric constant d31 of the ZnO thin film deposited under best conditions is calculated as -3.21 pC/N by the LDV data. This value is higher than other published works. In future, these ZnO thin films will be used in our ongoing project for the design, simulation and fabrication of smart slider with a built-in ZnO sensor/actuator in the hard disk drives.

  3. Structural changes in graphene oxide thin film by electron-beam irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Tyagi, Chetna, E-mail: tchetna91@gmail.com [Materials Science Group, Inter University Accelerator Centre, New Delhi 67 (India); Lakshmi, G.B.V.S.; Kumar, Sunil; Tripathi, Ambuj [Materials Science Group, Inter University Accelerator Centre, New Delhi 67 (India); Avasthi, D.K. [Amity University, Noida 201313, Uttar Pradesh (India)

    2016-07-15

    Although we have a whole class of 2D materials, graphene has drawn much attention for its excellent electronic, optical, thermal and mechanical properties. Recent researches have shown its large scale production by the reduction of graphene oxide either thermally, chemically or electrochemically. Although the structure of graphene oxide is inhomogeneous and hence complicated due to the presence of organic moieties e.g. epoxy, carboxylic acid, hydroxyl groups etc., its properties can be tuned by reduction according to desired application. The aim of this work is to synthesize continuous thin film of graphene oxide using commercially available graphene oxide solution and to study its reduction by 25 keV electron beam irradiation at fluences varying from 2 × 10{sup 11} to 2 × 10{sup 13} e{sup −}/cm{sup 2}. Our studies using X-ray diffraction, Raman microscopy and UV–Vis spectroscopy showed that electron-beam irradiation is an effective tool for reduction of graphene oxide and for tuning its band gap.

  4. Structural, optical and electrochemical properties of F-doped vanadium oxide transparent semiconducting thin films

    Science.gov (United States)

    Mousavi, M.; Khorrami, Gh. H.; Kompany, A.; Yazdi, Sh. Tabatabai

    2017-12-01

    In this study, F-doped vanadium oxide thin films with doping levels up to 60 at % were prepared by spray pyrolysis method on glass substrates. To measure the electrochemical properties, some films were deposited on fluorine-tin oxide coated glass substrates. The effect of F-doping on the structural, electrical, optical and electrochemical properties of vanadium oxide samples was investigated. The X-ray diffractographs analysis has shown that all the samples grow in tetragonal β-V2O5 phase structure with the preferred orientation of [200]. The intensity of (200) peak belonging to β-V2O5 phase was strongest in the undoped vanadium oxide film. The scanning electron microscopy images show that the samples have nanorod- and nanobelt-shaped structure. The size of the nanobelts in the F-doped vanadium oxide films is smaller than that in the pure sample and the width of the nanobelts increases from 30 to 70 nm with F concentration. With increasing F-doping level from 10 to 60 at %, the resistivity, the transparency and the optical band gap decrease from 111 to 20 Ω cm, 70 to 50% and 2.4 to 2.36 eV, respectively. The cyclic voltammogram (CV) results show that the undoped sample has the most extensive CV and by increasing F-doping level from 20 to 60 at %, the area of the CV is expanded. The anodic and cathodic peaks in F-doped samples are stronger.

  5. Femtosecond laser surface structuring and oxidation of chromium thin coatings: Black chromium

    Energy Technology Data Exchange (ETDEWEB)

    Kotsedi, L., E-mail: Kotsedi@tlabs.ac.za [UNESCO-UNISA Africa Chair in Nanosciences-Nanotechnology, College of Graduate Studies, University of South Africa, Muckleneuk Ridge, P.O. Box 392, Pretoria (South Africa); Nanosciences African Network (NANOAFNET), iThemba LABS-National Research Foundation, 1 Old Faure Road, Somerset West 7129, P.O. Box 722, Somerset West, Western Cape (South Africa); Nuru, Z.Y. [UNESCO-UNISA Africa Chair in Nanosciences-Nanotechnology, College of Graduate Studies, University of South Africa, Muckleneuk Ridge, P.O. Box 392, Pretoria (South Africa); Nanosciences African Network (NANOAFNET), iThemba LABS-National Research Foundation, 1 Old Faure Road, Somerset West 7129, P.O. Box 722, Somerset West, Western Cape (South Africa); Mthunzi, P. [National Laser Centre, Council for Scientific and Industrial Research, 0001 Pretoria (South Africa); Muller, T.F.G. [University of the Western Cape, Physics Department, Bellville, 7535 Cape Town (South Africa); Eaton, S.M. [Physics Department, Politecnico di Milano, Piazza Leonardo Da Vinci, 32, 20133 Milano (Italy); Julies, B. [University of the Western Cape, Physics Department, Bellville, 7535 Cape Town (South Africa); Manikandan, E. [UNESCO-UNISA Africa Chair in Nanosciences-Nanotechnology, College of Graduate Studies, University of South Africa, Muckleneuk Ridge, P.O. Box 392, Pretoria (South Africa); Nanosciences African Network (NANOAFNET), iThemba LABS-National Research Foundation, 1 Old Faure Road, Somerset West 7129, P.O. Box 722, Somerset West, Western Cape (South Africa); Ramponi, R. [Physics Department, Politecnico di Milano, Piazza Leonardo Da Vinci, 32, 20133 Milano (Italy); Maaza, M. [UNESCO-UNISA Africa Chair in Nanosciences-Nanotechnology, College of Graduate Studies, University of South Africa, Muckleneuk Ridge, P.O. Box 392, Pretoria (South Africa); Nanosciences African Network (NANOAFNET), iThemba LABS-National Research Foundation, 1 Old Faure Road, Somerset West 7129, P.O. Box 722, Somerset West, Western Cape (South Africa)

    2014-12-01

    Highlights: • Oxidation of the chromium thin film to chromium oxide by femtosecond laser with a fundamental wavelength of 1064 nm. • Solar absorber from chromium oxide that low percentage reflectance. • Femtosecond laser oxidation, with a de-focused laser. • Chromium oxide formation by femtosecond laser in normal ambient. - Abstract: In view of their potential applications as selective solar absorbers, chromium coatings on float glass substrates were nano/micro structured by femtosecond laser in air. Raman and X-rays diffraction investigations confirmed the formation of an ultra-porous α-Cr{sub 2}O{sub 3} layer at the surface; higher is the input laser power, enhanced is the crystallinity of the α-Cr{sub 2}O{sub 3} layer. The α-Cr{sub 2}O{sub 3} layer with the Cr underneath it in addition to the photo-induced porosity acted as a classical ceramic–metal nano-composite making the reflectance to decrease significantly within the spectral range of 190–1100 nm. The average reflectance decreased from 70 to 2%.

  6. Electrochromics for smart windows: Oxide-based thin films and devices

    Energy Technology Data Exchange (ETDEWEB)

    Granqvist, Claes G.

    2014-08-01

    Electrochromic (EC) smart windows are able to vary their throughput of visible light and solar energy by the application of an electrical voltage and are able to provide energy efficiency and indoor comfort in buildings. Section 1 explains why this technology is important and timely by first outlining today's precarious situation concerning increasing energy use and associated effects on the world's climate, and this section also underscores the great importance of enhancing the energy efficiency of buildings by letting them function more in harmony with the environment—particularly its varying temperature—than is possible with current mainstream technologies. This same chapter also surveys recent work on the energy savings and other benefits that are possible with EC-based technologies. Section 2 then provides some notes on the history of the EC effect and its applications. Section 3 presents a generic design for the oxide-based EC devices that are most in focus for present-day applications and research. This design includes five superimposed layers with a centrally-positioned electrolyte connecting two oxide films—at least one of which having EC properties—and with transparent electrical conductors surrounding the three-layer structure in the middle. It is emphasized that this construction can be viewed as a thin-film electrical battery whose charging state is manifested as optical absorption. Also discussed are six well known hurdles for the implementation of these EC devices, as well as a number of practical constructions of EC-based smart windows. Section 4 is an in-depth discussion of various aspects of EC oxides. It begins with a literature survey for 2007–2013, which updates earlier reviews, and is followed by a general discussion of optical and electronic effects and, specifically, on charge transfer absorption in tungsten oxide. Ionic effects are then treated with foci on the inherent nanoporosity of the important EC oxides and on the

  7. Physical properties investigation of reduced graphene oxide thin films prepared by material inkjet printing

    Czech Academy of Sciences Publication Activity Database

    Schmiedová, V.; Pospíšil, J.; Kovalenko, A.; Ashcheulov, Petr; Fekete, Ladislav; Cubon, T.; Kotrusz, P.; Zmeškal, O.; Weiter, M.

    2017-01-01

    Roč. 2017, Aug (2017), s. 1-8, č. článku 3501903. ISSN 1687-4110 R&D Projects: GA MŠk LO1409; GA MŠk LM2015088; GA ČR(CZ) GA15-05095S Grant - others:SAFMAT(XE) CZ.2.16/3.1.00/22132; GA MŠk(CZ) LO1211 Institutional support: RVO:68378271 Keywords : graphene oxide * thin film * transparent electrode * inkjet printing Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.871, year: 2016

  8. Aligned carbon nanotube, graphene and graphite oxide thin films via substrate-directed rapid interfacial deposition.

    Science.gov (United States)

    D'Arcy, Julio M; Tran, Henry D; Stieg, Adam Z; Gimzewski, James K; Kaner, Richard B

    2012-05-21

    A procedure for depositing thin films of carbon nanostructures is described that overcomes the limitations typically associated with solution based methods. Transparent and conductively continuous carbon coatings can be grown on virtually any type of substrate within seconds. Interfacial surface tension gradients result in directional fluid flow and film spreading at the water/oil interface. Transparent films of carbon nanostructures are produced including aligned ropes of single-walled carbon nanotubes and assemblies of single sheets of chemically converted graphene and graphite oxide. Process scale-up, layer-by-layer deposition, and a simple method for coating non-activated hydrophobic surfaces are demonstrated.

  9. Zinc oxide integrated area efficient high output low power wavy channel thin film transistor

    KAUST Repository

    Hanna, Amir

    2013-11-26

    We report an atomic layer deposition based zinc oxide channel material integrated thin film transistor using wavy channel architecture allowing expansion of the transistor width in the vertical direction using the fin type features. The experimental devices show area efficiency, higher normalized output current, and relatively lower power consumption compared to the planar architecture. This performance gain is attributed to the increased device width and an enhanced applied electric field due to the architecture when compared to a back gated planar device with the same process conditions.

  10. The structure and the gas sensitive properties of the thin films of zinc oxide

    Science.gov (United States)

    Zhilova, O. V.; Pankov, S. Yu.; Sitnikov, A. V.; Kalinin, Yu. E.; Babkina, I. V.

    2017-09-01

    The zinc oxide (ZnO) thin films were obtained by the ion-beam sputtering. It was shown that ZnO films have a hexagonal crystal structure of the space symmetry group P63mc. The film is slightly textured in the direction (0002). After the heat treatment, the crystal structure is preserved. A ZnO film with a thickness of 90 nm was annealed at a temperature of 600 °C. The relative change in the resistance of this film at a temperature of 400 °C after the addition of hydrogen to the air with a partial pressure of 5 Torr showed high values.

  11. Electrodeposition and characterization of CdS thin films on stainless steel and tin oxide substrates

    Energy Technology Data Exchange (ETDEWEB)

    Fatas, E.; Herrasti, P.; Arjona, F.; Garcia Camarero, E.; Medina, J.A.

    1987-01-01

    In recent years, there has been considerable interest in electrodepositing CdS as thin films for use in photovoltaic, photorelectrochemical cells, selective surfaces, etc. Cadmium sulphide films are electrodeposited from dimethylsulphoxide (DMSO) and propylene carbonate (PC) on stainless steel and tin oxide substrates. The physical properties of the films grown in both solvents have been studied. The thickness, grain size and morphology of the CdS films have been examined using X-ray diffractometer patterns and scanning electron microscopy. Heat treatment in argon atmosphere improves the electrical conductivity of the samples.

  12. Zinc oxide nanowire photodetectors with single-walled carbon nanotube thin-film electrodes.

    Science.gov (United States)

    Ates, Elif Selen; Kucukyildiz, Seyda; Unalan, Husnu Emrah

    2012-10-24

    In this study, transparent and flexible zinc oxide (ZnO) nanowire ultraviolet (UV) photodetectors prepared via a solution-based method in which single-walled carbon nanotube (SWNT) thin films were used as transparent electrodes are reported. The photoresponse current was found to be in proportion with the ZnO nanowire density, and the nanowire density could be tuned to increase the photocurrent by a factor of 300. The decay time for the fabricated photodetectors was found to be as low as 16 s. This study suggests the possibility of fabricating inexpensive, visible-blind UV photodetectors via solution-based methods.

  13. Chemical etching of zinc oxide for thin-film silicon solar cells.

    Science.gov (United States)

    Hüpkes, Jürgen; Owen, Jorj I; Pust, Sascha E; Bunte, Eerke

    2012-01-16

    Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  14. A facile fabrication of chemically converted graphene oxide thin films and their uses as absorber materials for solar cells

    Science.gov (United States)

    Adelifard, Mehdi; Darudi, Hosein

    2016-07-01

    There is a great interest in the use of graphene sheets in thin film solar cells with low-cost and good-optoelectronic properties. Here, the production of absorbent conductive reduced graphene oxide (RGO) thin films was investigated. RGO thin films were prepared from spray-coated graphene oxide (GO) layers at various substrate temperature followed by a simple hydrazine-reducing method. The structural, morphological, optical, and electrical characterizations of graphene oxide (GO) and RGO thin films were investigated. X-ray diffraction analysis showed a phase shift from GO to RGO due to hydrazine treatment, in agreement with the FTIR spectra of the layers. FESEM images clearly exhibited continuous films resulting from the overlap of graphene nanosheets. The produced low-cost thin films had high absorption coefficient up to 1.0 × 105 cm-1, electrical resistance as low as 0.9 kΩ/sq, and effective optical band gap of about 1.50 eV, close to the optimum value for solar conversion. The conductive absorbent properties of the reduced graphene oxide thin films would be useful to develop photovoltaic cells.

  15. Drop-photochemical deposition of aluminum oxide thin films from aqueous solutions

    Science.gov (United States)

    Sato, Shunta; Ichimura, Masaya

    2017-04-01

    Aluminum oxide thin films were deposited onto fluorine-doped tin oxide-coated glass by drop photochemical deposition for the first time. The deposition solution was deionized water containing aluminum sulfate and sodium thiosulfate. Small amount of the solution was dropped on the substrate and irradiated with UV light. The solution was replaced with new one after 5 min irradiation, and the process was repeated 10 times. A film was not deposited without thiosulfate ions in the solution. The deposited films were transparent, and their band gap was larger than 4 eV. The O/Al composition ratio was about 1.2, smaller than the stoichiometric ratio 1.5.

  16. X-ray absorption spectroscopy studies of electrochemically deposited thin oxide films.

    Energy Technology Data Exchange (ETDEWEB)

    Balasubramanian, M.

    1998-06-02

    We have utilized ''in situ'' X-ray Absorption Fine Structure Spectroscopy to investigate the structure and composition of thin oxide films of nickel and iron that have been prepared by electrodeposition on a graphite substrate from aqueous solutions. The films are generally disordered. Structural information has been obtained from the analysis of the data. We also present initial findings on the local structure of heavy metal ions, e.g. Sr and Ce, incorporated into the electrodeposited nickel oxide films. Our results are of importance in a number of technological applications, among them, batteries, fuel cells, electrochromic and ferroelectric materials, corrosion protection, as well as environmental speciation and remediation.

  17. Inkjet-Printed In-Ga-Zn Oxide Thin-Film Transistors with Laser Spike Annealing

    Science.gov (United States)

    Huang, Hang; Hu, Hailong; Zhu, Jingguang; Guo, Tailiang

    2017-07-01

    Inkjet-printed In-Ga-Zn oxide (IGZO) thin-film transistors (TFTs) have been fabricated at low temperature using laser spike annealing (LSA) treatment. Coffee-ring effects during the printing process were eliminated to form uniform IGZO films by simply increasing the concentration of solute in the ink. The impact of LSA on the TFT performance was studied. The field-effect mobility, threshold voltage, and on/off current ratio were greatly influenced by the LSA treatment. With laser scanning at 1 mm/s for 40 times, the 30-nm-thick IGZO TFT baked at 200°C showed mobility of 1.5 cm2/V s, threshold voltage of -8.5 V, and on/off current ratio >106. Our findings demonstrate the feasibility of rapid LSA treatment of low-temperature inkjet-printed oxide semiconductor transistors, being comparable to those obtained by conventional high-temperature annealing.

  18. Probing of 2 dimensional confinement-induced structural transitions in amorphous oxide thin film

    Science.gov (United States)

    Lee, Sung Keun; Ahn, Chi Won

    2014-01-01

    Whereas the atomic structure of surface of crystals is known to be distinct from that of bulk, experimental evidence for thickness-induced structural transitions in amorphous oxides is lacking. We report the NMR result for amorphous alumina with varying thickness from bulk up to 5 nm, revealing the nature of structural transitions near amorphous oxide surfaces/interfaces. The coordination environments in the confined amorphous alumina thin film are distinct from those of bulk, highlighted by a decrease in the fractions of high-energy clusters (and thus the degree of disorder) with thickness. The result implies that a wide range of variations in amorphous structures may be identified by controlling its dimensionality. PMID:24569515

  19. Low-temperature atomic layer deposition of copper(II) oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Iivonen, Tomi, E-mail: tomi.iivonen@helsinki.fi; Hämäläinen, Jani; Mattinen, Miika; Popov, Georgi; Leskelä, Markku [Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 Helsinki (Finland); Marchand, Benoît; Mizohata, Kenichiro [Division of Materials Physics, Department of Physics, University of Helsinki, P.O. Box 43, FI-00014 Helsinki (Finland); Kim, Jiyeon; Fischer, Roland A. [Chair of Inorganic Chemistry II, Ruhr-University Bochum, Universitätsstrasse 150, 44780 Bochum (Germany)

    2016-01-15

    Copper(II) oxide thin films were grown by atomic layer deposition (ALD) using bis-(dimethylamino-2-propoxide)copper [Cu(dmap){sub 2}] and ozone in a temperature window of 80–140 °C. A thorough characterization of the films was performed using x-ray diffraction, x-ray reflectivity, UV‐Vis spectrophotometry, atomic force microscopy, field emission scanning electron microscopy, x-ray photoelectron spectroscopy, and time-of-flight elastic recoil detection analysis techniques. The process was found to produce polycrystalline copper(II) oxide films with a growth rate of 0.2–0.3 Å per cycle. Impurity content in the films was relatively small for a low temperature ALD process.

  20. Amorphous Zinc Oxide Integrated Wavy Channel Thin Film Transistor Based High Performance Digital Circuits

    KAUST Repository

    Hanna, Amir

    2015-12-04

    High performance thin film transistor (TFT) can be a great driving force for display, sensor/actuator, integrated electronics, and distributed computation for Internet of Everything applications. While semiconducting oxides like zinc oxide (ZnO) present promising opportunity in that regard, still wide area of improvement exists to increase the performance further. Here, we show a wavy channel (WC) architecture for ZnO integrated TFT which increases transistor width without chip area penalty, enabling high performance in material agnostic way. We further demonstrate digital logic NAND circuit using the WC architecture and compare it to the conventional planar architecture. The WC architecture circuits have shown 2× higher peak-to-peak output voltage for the same input voltage. They also have 3× lower high-to-low propagation delay times, respectively, when compared to the planar architecture. The performance enhancement is attributed to both extra device width and enhanced field effect mobility due to higher gate field electrostatics control.

  1. Chemical solution deposited lanthanum zirconium oxide thin films: Synthesis and chemistry

    Energy Technology Data Exchange (ETDEWEB)

    Chen, H.S., E-mail: sean.chen@cantab.net [Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ (United Kingdom); Kumar, R.V.; Glowacki, B.A. [Department of Materials Science and Metallurgy, University of Cambridge, Pembroke Street, Cambridge CB2 3QZ (United Kingdom)

    2010-07-01

    Pyrochlore lanthanum zirconium oxide (LZO) thin films textured along <4 0 0> are synthesized using lanthanum acetate hydrate, zirconium propoxide, propionic acid, acetic acid glacial, and methanol as precursors. The materials growth and chemistry are investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), Fourier transform infrared spectroscopy (FTIR), and thermal gravimetric analysis (TGA). The formation of inkjet printed LZO films on Ni-5%W tape is found to be based on the decomposition of the LZO precursor solution. In the annealing process, Zr metal-oxides bonds are first eliminated between 150 and 250 deg. C, while carboxylates from precursors remain in LZO after the annealing carried out at 900 {sup o}C for an hour. Annealed LZO films have dense and smooth structure that are composed of nanoparticles sizing 10-15 nm and some pinholes sizing 25-35 nm accounted for less than 0.1% of the area are observed.

  2. Structural and magnetic properties of iron oxides in co-sputtered granular thin films

    Science.gov (United States)

    Randrianantoandro, N.; Laffez, P.; Sella, C.; Greneche, J. M.

    2000-02-01

    Granular Fe-V2O5 thin films with different iron concentrations prepared by means of radiofrequency magnetron co-sputtering technique were investigated by means of X-ray diffraction, Transmission Electron Microscopy and ^{57}Fe Mössbauer spectrometry as a function of iron concentration. A common experimental feature reveals that a percolation-like threshold occurs at around 23-25% atomic Fe. Below such a critical value, the co-sputtering process favours the presence of ultrafine amorphous oxide grains with sizes lower than 10 nm embedded in a vanadium oxide matrix. Above, one clearly observes the presence of fine grains (sizes comprised between 10-100 nm) composed of either hematite or maghemite phases dispersed in the same matrix, the set displaying a magnetic order at room temperature.

  3. Characteristics of Thermally Reduced Graphene Oxide Thin Film as DSSC Counter Electrode

    Science.gov (United States)

    Yuliasari, F.; Aprilia, A.; Syakir, N.; Safriani, L.; Saragi, T.; Risdiana; Hidayat, S.; Bahtiar, A.; Siregar, R.; Fitrilawati

    2017-05-01

    We report characteristics of reduced graphene oxide (RGO) as a counter electrode for dye-sensitized solar cell (DSSC). The RGO thin films were prepared on FTO (Fluorine-doped Tin Oxide) substrates and followed by a reduction process. The RGO film was used as a counter electrode in a DSSC device, with a structure of FTO/TiO2/ruthenium dye/mosalyte/RGO/FTO. UV-Vis measurements show an increasing absorption spectrum of RGO film after thermal reduction process and the FT-IR spectrum confirms a removal of the oxygen containing groups after thermal reduction process. The efficiency (η) of the DSSC that applied RGO film as a counter electrode is 0.96%.

  4. A model bismuth oxide intergranular thin film in a ZnO twist grain boundary.

    Science.gov (United States)

    Domingos, H S

    2010-04-14

    The electronic properties of a model bismuth oxide intergranular film in ZnO were investigated using density functional plane wave calculations. It was found that oxygen excess plays a fundamental role in the appearance of electrical activity. The introduction by oxygen interstitials or zinc vacancies results in depletion of the charge in deep gap states introduced by the bismuth impurities. This makes the boundary less metallic and promotes the formation of acceptor states localized to the boundary core, resulting in Schottky barrier enhancement. The results indicate that the origin of electrical activity in thin intergranular bismuth oxide films is probably not distinct from that in decorated ZnO boundaries. © 2010 IOP Publishing Ltd

  5. Tuning electrical properties in amorphous zinc tin oxide thin films for solution processed electronics.

    Science.gov (United States)

    Chandra, R Devi; Rao, Manohar; Zhang, Keke; Prabhakar, Rajiv Ramanujam; Shi, Chen; Zhang, Jie; Mhaisalkar, Subodh G; Mathews, Nripan

    2014-01-22

    Solution processed zinc tin oxide (ZTO) thin film transistors (TFTs) were fabricated by varying the Zn/Sn composition. The addition of Sn to the zinc oxide (ZnO) films resulted in improved electrical characteristics, with devices of Zn0.7Sn0.3O composition showing the highest mobility of 7.7 cm(2)/(V s). An improvement in subthreshold swings was also observed, indicative of a reduction of the interfacial trap densities. Mobility studies at low temperature have been carried out, which indicated that the activation energy was reduced with Sn incorporation. Kelvin probe force microscopy was performed on the films to evaluate work function and correlated to the metal-semiconductor barrier indicating Zn0.7Sn0.3O films had the smallest barrier for charge injection. Organic-inorganic hybrid complementary inverters with a maximum gain of 10 were fabricated by integrating ZTO TFTs with poly-3-hexylthiophene (P3HT) transistors.

  6. Morphology, structural and optical properties of iron oxide thin film photoanodes in photoelectrochemical cell: Effect of electrochemical oxidation

    Science.gov (United States)

    Maabong, Kelebogile; Machatine, Augusto G.; Hu, Yelin; Braun, Artur; Nambala, Fred J.; Diale, Mmantsae

    2016-01-01

    Hematite (α-Fe2O3) is a promising semiconductor as photoanode in solar hydrogen production from photoelectrolysis of water due to its appropriate band gap, low cost and high electrochemical stability in aqueous caustic electrolytes. Operation of such photoanode in a biased photoelectrochemical cell constitutes an anodization with consequent redox reactions at the electrode surface. α-Fe2O3 thin film photoanodes were prepared by simple and inexpensive dip coating method on fluorine doped tin oxide (FTO) glass substrate, annealed in air at 500 °C for 2 h, then electrochemically oxidized (anodized) in 1 M KOH at 500 mV for 1 min in dark and light conditions. Changes in structural properties and morphology of α-Fe2O3 nanoparticles films were investigated by XRD, Raman spectroscopy and a high resolution FE-SEM. The average grain size was observed to increase from 57 nm for pristine samples to 73 and 77 nm for anodized samples in dark and light respectively. Broadening and red shift in Raman spectra in anodized samples may be attributed to lattice expansion upon oxidation. The UV-visible measurements revealed enhanced absorption in the photoanodes after the treatment. The findings suggest that the anodization of the photoelectrode in a biased cell causes not only changes of the molecular structure at the surface, but also changes in the crystallographic structure which can be detected with x-ray diffractometry.

  7. Morphology, structural and optical properties of iron oxide thin film photoanodes in photoelectrochemical cell: Effect of electrochemical oxidation

    Energy Technology Data Exchange (ETDEWEB)

    Maabong, Kelebogile [Department of Physics, University of Pretoria, Pretoria 0002 (South Africa); Laboratory of High Ceramics, Empa, Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf (Switzerland); Department of Physics, University of Botswana, Private Bag 002, Gaborone (Botswana); Machatine, Augusto G. [Department of Physics, University of Pretoria, Pretoria 0002 (South Africa); Hu, Yelin [Laboratory of High Ceramics, Empa, Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf (Switzerland); Laboratory for Photonics and Interfaces, EPFL, Ecole Polytechnique Federale de Lausanne, CH-1015 Lausanne (Switzerland); Braun, Artur [Laboratory of High Ceramics, Empa, Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf (Switzerland); Nambala, Fred J. [Department of Physics, University of Pretoria, Pretoria 0002 (South Africa); University of Zambia, Box 32379, Great East Road Campus, Lusaka (Zambia); Diale, Mmantsae, E-mail: mmantsae.diale@up.ac.za [Department of Physics, University of Pretoria, Pretoria 0002 (South Africa); Laboratory of High Ceramics, Empa, Swiss Federal Laboratories for Materials Science and Technology, CH-8600 Dübendorf (Switzerland)

    2016-01-01

    Hematite (α-Fe{sub 2}O{sub 3}) is a promising semiconductor as photoanode in solar hydrogen production from photoelectrolysis of water due to its appropriate band gap, low cost and high electrochemical stability in aqueous caustic electrolytes. Operation of such photoanode in a biased photoelectrochemical cell constitutes an anodization with consequent redox reactions at the electrode surface. α-Fe{sub 2}O{sub 3} thin film photoanodes were prepared by simple and inexpensive dip coating method on fluorine doped tin oxide (FTO) glass substrate, annealed in air at 500 °C for 2 h, then electrochemically oxidized (anodized) in 1 M KOH at 500 mV for 1 min in dark and light conditions. Changes in structural properties and morphology of α-Fe{sub 2}O{sub 3} nanoparticles films were investigated by XRD, Raman spectroscopy and a high resolution FE-SEM. The average grain size was observed to increase from ~57 nm for pristine samples to 73 and 77 nm for anodized samples in dark and light respectively. Broadening and red shift in Raman spectra in anodized samples may be attributed to lattice expansion upon oxidation. The UV–visible measurements revealed enhanced absorption in the photoanodes after the treatment. The findings suggest that the anodization of the photoelectrode in a biased cell causes not only changes of the molecular structure at the surface, but also changes in the crystallographic structure which can be detected with x-ray diffractometry.

  8. Vanadium and molybdenum oxide thin films on Au(111). Growth and surface characterization

    Energy Technology Data Exchange (ETDEWEB)

    Guimond, Sebastien

    2009-06-04

    The growth and the surface structure of well-ordered V{sub 2}O{sub 3}, V{sub 2}O{sub 5} and MoO{sub 3} thin films have been investigated in this work. These films are seen as model systems for the study of elementary reaction steps occurring on vanadia and molybdena-based selective oxidation catalysts. It is shown that well-ordered V{sub 2}O{sub 3}(0001) thin films can be prepared on Au(111). The films are terminated by vanadyl groups which are not part of the V{sub 2}O{sub 3} bulk structure. Electron irradiation specifically removes the oxygen atoms of the vanadyl groups, resulting in a V-terminated surface. The fraction of removed vanadyl groups is controlled by the electron dose. Such surfaces constitute interesting models to probe the relative role of both the vanadyl groups and the undercoordinated V ions at the surface of vanadia catalysts. The growth of well-ordered V{sub 2}O{sub 5}(001) and MoO{sub 3}(010) thin films containing few point defects is reported here for the first time. These films were grown on Au(111) by oxidation under 50 mbar O{sub 2} in a dedicated high pressure cell. Contrary to some of the results found in the literature, the films are not easily reduced by annealing in UHV. This evidences the contribution of radiation and surface contamination in some of the reported thermal reduction experiments. The growth of ultrathin V{sub 2}O{sub 5} and MoO{sub 3} layers on Au(111) results in formation of interface-specific monolayer structures. These layers are coincidence lattices and they do not correspond to any known oxide bulk structure. They are assumed to be stabilized by electronic interaction with Au(111). Their formation illustrates the polymorphic character and the ease of coordination units rearrangement which are characteristic of both oxides. The formation of a second layer apparently precedes the growth of bulk-like crystallites for both oxides. This observation is at odds with a common assumption that crystals nucleate as soon as a

  9. Analysis of indium zinc oxide thin films by laser-induced breakdown spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Popescu, A. C. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France); National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); Beldjilali, S. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France); LPPMCA, Universite des Sciences et de la Technologie d' Oran, BP 1505 El Mnaouer, Oran (Algeria); Socol, G.; Mihailescu, I. N. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); Craciun, V. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov 077125 (Romania); MAIC, University of Florida, Gainesville, FL 32611 (United States); Hermann, J. [LP3, CNRS - Universite Aix-Marseille, 163 Ave. de Luminy, Marseille 13288 (France)

    2011-10-15

    We have performed spectroscopic analysis of the plasma generated by Nd:YAG ({lambda} = 266 nm) laser irradiation of thin indium zinc oxide films with variable In content deposited by combinatorial pulsed laser deposition on glass substrates. The samples were irradiated in 5 x 10{sup 4} Pa argon using laser pulses of 5 ns duration and 10 mJ energy. The plasma emission spectra were recorded with an Echelle spectrometer coupled to a gated detector with different delays with respect to the laser pulse. The relative concentrations of indium and zinc were evaluated by comparing the measured spectra to the spectral radiance computed for a plasma in local thermal equilibrium. Plasma temperature and electron density were deduced from the relative intensities and Stark broadening of spectral lines of atomic zinc. Analyses at different locations on the deposited thin films revealed that the In/(In + Zn) concentration ratio significantly varies over the sample surface, from 0.4 at the borders to about 0.5 in the center of the film. The results demonstrate that laser-induced breakdown spectroscopy allows for precise and fast characterization of thin films with variable composition.

  10. Multi-Walled Carbon Nanotube-Doped Tungsten Oxide Thin Films for Hydrogen Gas Sensing

    Directory of Open Access Journals (Sweden)

    Adisorn Tuantranont

    2010-08-01

    Full Text Available In this work we have fabricated hydrogen gas sensors based on undoped and 1 wt% multi-walled carbon nanotube (MWCNT-doped tungsten oxide (WO3 thin films by means of the powder mixing and electron beam (E-beam evaporation technique. Hydrogen sensing properties of the thin films have been investigated at different operating temperatures and gas concentrations ranging from 100 ppm to 50,000 ppm. The results indicate that the MWCNT-doped WO3 thin film exhibits high sensitivity and selectivity to hydrogen. Thus, MWCNT doping based on E-beam co-evaporation was shown to be an effective means of preparing hydrogen gas sensors with enhanced sensing and reduced operating temperatures. Creation of nanochannels and formation of p-n heterojunctions were proposed as the sensing mechanism underlying the enhanced hydrogen sensitivity of this hybridized gas sensor. To our best knowledge, this is the first report on a MWCNT-doped WO3 hydrogen sensor prepared by the E-beam method.

  11. Memristive properties of transparent oxide semiconducting (Ti,Cu)O x -gradient thin film

    Science.gov (United States)

    Domaradzki, Jarosław; Kotwica, Tomasz; Mazur, Michał; Kaczmarek, Danuta; Wojcieszak, Damian

    2018-01-01

    The paper presents the results of the analysis of memristive properties observed in (Ti,Cu)-oxide thin film with gradient distribution of elements, prepared using the multi-source reactive magnetron co-sputtering process. The performed electrical measurements showed the presence of pinched hysteresis loops in the voltage–current plane for direct and alternating current bipolar periodic signal stimulation. Investigations performed using a transmission electron microscope equipped with an energy dispersive spectrometer showed that the elemental composition at the cross section of the thin film was very well correlated with the gradient V-shaped profile of the powering of the magnetron source equipped with a Cu target. The prepared samples were transparent in the visible part of optical radiation. The obtained results showed that the prepared gradient (Ti,Cu)O x thin film could be an interesting alternative to the conventional multilayer stack construction of memristive devices, which makes them a promising material for manufacturing transparent memory devices for transparent electronics.

  12. Graphene oxide/carbon nanoparticle thin film based IR detector: Surface properties and device characterization

    Energy Technology Data Exchange (ETDEWEB)

    Chowdhury, Farzana Aktar [Experimental Physics Division, Atomic Energy Centre, 4, Kazi Nazrul Islam Avenue, Dhaka-1000 (Bangladesh); Hossain, Mohammad Abul [Department of Chemistry, Faculty of Science, University of Dhaka, Dhaka-1000 (Bangladesh); Uchida, Koji; Tamura, Takahiro; Sugawa, Kosuke; Mochida, Tomoaki; Otsuki, Joe [College of Science and Technology, Nihon University, 1-8-14 Kanda Surugadai, Chiyoda-ku, Tokyo 101-8308 (Japan); Mohiuddin, Tariq [Department of Physics, College of Science, Sultan Qaboos University, Muscat (Oman); Boby, Monny Akter [Department of Physics, Faculty of Science, University of Dhaka, Dhaka-1000 (Bangladesh); Alam, Mohammad Sahabul, E-mail: msalam@ksu.edu.sa [Department of Physics, Faculty of Science, University of Dhaka, Dhaka-1000 (Bangladesh); Department of Chemical Engineering, College of Engineering & King Abdullah Institute for Nanotechnology, King Saud University, P.O. Box 2455, Riyadh 11451 (Saudi Arabia)

    2015-10-15

    This work deals with the synthesis, characterization, and application of carbon nanoparticles (CNP) adorned graphene oxide (GO) nanocomposite materials. Here we mainly focus on an emerging topic in modern research field presenting GO-CNP nanocomposite as a infrared (IR) radiation detector device. GO-CNP thin film devices were fabricated from liquid phase at ambient condition where no modifying treatments were necessary. It works with no cooling treatment and also for stationary objects. A sharp response of human body IR radiation was detected with time constants of 3 and 36 sec and radiation responsivity was 3 mAW{sup −1}. The current also rises for quite a long time before saturation. This work discusses state-of-the-art material developing technique based on near-infrared photon absorption and their use in field deployable instrument for real-world applications. GO-CNP-based thin solid composite films also offer its potentiality to be utilized as p-type absorber material in thin film solar cell, as well.

  13. Electrical properties of thin film transistors with zinc tin oxide channel layer

    Science.gov (United States)

    Hong, Seunghwan; Oh, Gyujin; Kim, Eun Kyu

    2017-10-01

    We have investigated thin film transistors (TFTs) with zinc tin oxide (ZTO) channel layer fabricated by using an ultra-high vacuum radio frequency sputter. ZTO thin films were grown at room temperature by co-sputtering of ZnO and SnO2, which applied power for SnO2 target was varied from 15 W to 90 W under a fixed sputtering power of 70 W for ZnO target. A post-annealing treatment to improve the film quality was done at temperature ranges from 300 to 600 °C by using the electrical furnace. The ZTO thin films showed good electrical and optical properties such as Hall mobility of more than 9 cm2/V·s, specific resistivity of about 2 × 102 Ω·cm, and optical transmittance of 85% in visible light region by optical bandgap of 3.3 eV. The ZTO-TFT with an excellent performance of channel mobility of 19.1 cm2/V·s and on-off ratio ( I on / I off ) of 104 was obtained from the films grown with SnO2 target power of 25 W and post-annealed at 450 °C. This result showed that ZTO film is promising on application to a high performance transparent TFTs.

  14. Graphene oxide/carbon nanoparticle thin film based IR detector: Surface properties and device characterization

    Directory of Open Access Journals (Sweden)

    Farzana Aktar Chowdhury

    2015-10-01

    Full Text Available This work deals with the synthesis, characterization, and application of carbon nanoparticles (CNP adorned graphene oxide (GO nanocomposite materials. Here we mainly focus on an emerging topic in modern research field presenting GO-CNP nanocomposite as a infrared (IR radiation detector device. GO-CNP thin film devices were fabricated from liquid phase at ambient condition where no modifying treatments were necessary. It works with no cooling treatment and also for stationary objects. A sharp response of human body IR radiation was detected with time constants of 3 and 36 sec and radiation responsivity was 3 mAW−1. The current also rises for quite a long time before saturation. This work discusses state-of-the-art material developing technique based on near-infrared photon absorption and their use in field deployable instrument for real-world applications. GO-CNP-based thin solid composite films also offer its potentiality to be utilized as p-type absorber material in thin film solar cell, as well.

  15. The Effect of Thermal Annealing Processes on Structural and Photoluminescence of Zinc Oxide Thin Film

    Directory of Open Access Journals (Sweden)

    Huai-Shan Chin

    2013-01-01

    Full Text Available This study used radio frequency sputtering at room temperature to prepare a zinc oxide (ZnO thin film. After deposition, the thin film was placed in a high-temperature furnace to undergo thermal annealing at different temperatures (300, 400, 500, and 600°C and for different dwelling times (15, 30, 45, and 60 min. The objective was to explore the effects that the described process had on the thin film’s internal structure and luminescence properties. A scanning electron microscope topographic image showed that the size of the ZnO crystals grew with increases in either the thermal annealing temperature or the dwelling time. However, significant differences in the levels of influence caused by increasing the thermal annealing temperature or dwelling time existed; the thermal annealing temperature had a greater effect on crystal growth when compared to the dwelling time. Furthermore, the crystallization directions of ZnO (002, (101, (102, and (103 can be clearly observed through an X-ray diffraction analysis, and crystallization strength increased with an increase in the thermal annealing temperature. The photoluminescence measurement spectra showed that ultraviolet (UV emission intensity increased with increases in thermal annealing temperature and dwelling time. However, when the thermal annealing temperature reached 600°C or when the dwelling time reached 60 min, even exhibited a weak green light emission peak.

  16. Fully transparent flexible tin-doped zinc oxide thin film transistors fabricated on plastic substrate.

    Science.gov (United States)

    Han, Dedong; Zhang, Yi; Cong, Yingying; Yu, Wen; Zhang, Xing; Wang, Yi

    2016-12-12

    In this work, we have successfully fabricated bottom gate fully transparent tin-doped zinc oxide thin film transistors (TZO TFTs) fabricated on flexible plastic substrate at low temperature by RF magnetron sputtering. The effect of O2/Ar gas flow ratio during channel deposition on the electrical properties of TZO TFTs was investigated, and we found that the O2/Ar gas flow ratio have a great influence on the electrical properties. TZO TFTs on flexible substrate has very nice electrical characteristics with a low off-state current (Ioff) of 3 pA, a high on/off current ratio of 2 × 10(7), a high saturation mobility (μsat) of 66.7 cm(2)/V•s, a steep subthreshold slope (SS) of 333 mV/decade and a threshold voltage (Vth) of 1.2 V. Root-Mean-Square (RMS) roughness of TZO thin film is about 0.52 nm. The transmittance of TZO thin film is about 98%. These results highlight that the excellent device performance can be realized in TZO film and TZO TFT can be a promising candidate for flexible displays.

  17. Self-assembly of a thin highly reduced graphene oxide film and its high electrocatalytic activity.

    Science.gov (United States)

    Bai, Yan-Feng; Zhang, Yong-Fang; Zhou, An-Wei; Li, Hai-Wai; Zhang, Yu; Luong, John H T; Cui, Hui-Fang

    2014-10-10

    A thin highly reduced graphene oxide (rGO) film was self-assembled at the dimethyl formamide (DMF)-air interface through evaporation-induced water-assisted thin film formation at the pentane-DMF interface, followed by complete evaporation of pentane. The thin film was transferred onto various solid substrates for film characterization and electrochemical sensing. UV-visible spectrometry, scanning electron microscopy (SEM), atomic force microscopy (AFM) and electrochemistry techniques were used to characterize the film. An rGO film showing 82.8% of the transmittance at 550 nm corresponds to a few layers of rGO nanosheets. The rGO nanosheets cross-stack with each other, lying approximately in the plane of the film. An rGO film collected on a glassy carbon (GC) electrode exhibited improved electrical conductivity compared to GC, with the electrode charge-transfer resistance (Rct) reduced from 31 Ω to 22 Ω. The as-formed rGO/GC electrode was mechanically very stable, exhibiting significantly enhanced electrocatalytic activity to H(2)O(2) and dopamine. Multiple layers of the rGO films on the GC electrode showed even stronger electrocatalytic activity to dopamine than that of the single rGO film layer. The controllable formation of a stable rGO film on various solid substrates has potential applications for nanoelectronics and sensors/biosensors.

  18. Self-assembled single-phase perovskite nanocomposite thin films.

    Science.gov (United States)

    Kim, Hyun-Suk; Bi, Lei; Paik, Hanjong; Yang, Dae-Jin; Park, Yun Chang; Dionne, Gerald F; Ross, Caroline A

    2010-02-10

    Thin films of perovskite-structured oxides with general formula ABO(3) have great potential in electronic devices because of their unique properties, which include the high dielectric constant of titanates, (1) high-T(C) superconductivity in cuprates, (2) and colossal magnetoresistance in manganites. (3) These properties are intimately dependent on, and can therefore be tailored by, the microstructure, orientation, and strain state of the film. Here, we demonstrate the growth of cubic Sr(Ti,Fe)O(3) (STF) films with an unusual self-assembled nanocomposite microstructure consisting of (100) and (110)-oriented crystals, both of which grow epitaxially with respect to the Si substrate and which are therefore homoepitaxial with each other. These structures differ from previously reported self-assembled oxide nanocomposites, which consist either of two different materials (4-7) or of single-phase distorted-cubic materials that exhibit two or more variants. (8-12) Moreover, an epitaxial nanocomposite SrTiO(3) overlayer can be grown on the STF, extending the range of compositions over which this microstructure can be formed. This offers the potential for the implementation of self-organized optical/ferromagnetic or ferromagnetic/ferroelectric hybrid nanostructures integrated on technologically important Si substrates with applications in magnetooptical or spintronic devices.

  19. Thermo-electrical properties of composite semiconductor thin films composed of nanocrystalline graphene-vanadium oxides.

    Science.gov (United States)

    Jung, Hye-Mi; Um, Sukkee

    2014-12-01

    This paper presents an experimental comparative study involving the characterization of the thermo-electrical and structural properties of graphene-based vanadium oxide (graphene-VOx) composite thin films on insulating and conducting surfaces (i.e., fused quartz and acrylic resin-impregnated graphite) produced by a sol-gel process via dipping-pyrolysis. A combination of FE-SEM and XPS analyses revealed that the graphene-VOx composite thin films (coated onto fused quartz) exhibiting the microstructure of 2-graded nanowire arrays with a diameter of 40-80 nm were composed of graphene, a few residual oxygen-containing functional groups (i.e., C-O and C=O), and the VO2 Magnéli phase. The temperature-dependent electrical resistance measured on the as-deposited thin films clearly demonstrated that the graphene-VOx composite nanowire arrays thermally grown on fused quartz act as a semiconductor switch, with a transition temperature of 64.7 degrees C in the temperature range of -20 degrees C to 140 degrees C, resulting from the contributions of graphene and graphene oxides. In contrast, the graphene-VOx composite thin films deposited onto acrylic resin-impregnated graphite exhibit a superlinear semiconducting property of extremely low electrical resistance with negative temperature coefficients (i.e., approximately four orders of magnitude lower than that of the fused quartz), despite the similar microstructural and morphological characteristics. This difference is attributed to the synergistic effects of the paramagnetic metal feature of the tightly stacked nanowire arrays consisting of hexagonal V2O3 on the intrinsic electrical properties of the acrylic resin-impregnated graphite substrate, as revealed by FE-SEM, EDX, AFM, and XRD measurements. Although the thermo-sensitive electrical properties of the graphene-VOx composite thin films are very substrate specific, the applicability of graphene sheets can be considerably effective in the formation of highly planar arrays

  20. Photoresponse of p-type zinc-doped iron(III) oxide thin films.

    Science.gov (United States)

    Ingler, William B; Baltrus, John P; Khan, Shahed U M

    2004-08-25

    Stable zinc-doped iron(III) oxide thin films that exhibit p-type behavior were synthesized by spray pyrolytic deposition (SPD) on conducting indium-doped tin oxide-coated glass substrate. The highest photocurrent density of 1.1 mA/cm2 was observed at an illumination intensity of 40 mW/cm2 at -0.8 V vs Pt for zinc-doped p-Fe2O3 samples prepared at an optimum substrate temperature of 663 K using an optimum spray time of 70 s. A quantum efficiency of 21.1% at 325 nm was found for SPD samples prepared using a dopant concentration of 0.0088 M zinc nitrate hexahydrate. X-ray diffraction results showed structures of alpha-Fe2O3 and ZnFe2O4. A direct band gap energy of 2.2 eV was found from monochromatic photocurrent density data and agrees closely with the band gap obtained from UV-vis absorption. The X-ray photoelectron spectroscopy results also confirm the presence of zinc dopant (4.0 atomic %) in thin films of zinc-doped p-Fe2O3.

  1. Zinc oxide-potassium ferricyanide composite thin film matrix for biosensing applications.

    Science.gov (United States)

    Saha, Shibu; Arya, Sunil K; Singh, S P; Sreenivas, K; Malhotra, B D; Gupta, Vinay

    2009-10-27

    Thin film of zinc oxide-potassium ferricyanide (ZnO-KFCN) composite has been deposited on indium tin oxide (ITO) coated corning glass using pulsed laser deposition (PLD). The composite thin film electrode has been exploited for amperometric biosensing in a mediator-free electrolyte. The composite matrix has the advantages of high iso-electric point of ZnO along with enhanced electron communication due to the presence of a redox species in the matrix itself. Glucose oxidase (GOx) has been chosen as the model enzyme for studying the application of the developed matrix to biosensing. The sensing response of the bio-electrode, GOx/ZnO-KFCN/ITO/glass, towards glucose was studied using cylic voltammetry (CV) and photometric assay. The bio-electrode exhibits good linearity from 2.78 mM to 11.11 mM glucose concentration. The low value of Michaelis-Menten constant (1.69 mM) indicates an enhanced affinity of the immobilized enzyme towards its substrate. A quassireversible system is obtained with the composite matrix. The results confirm promising application of the ZnO-KFCN composite matrix for amperometric biosensing applications in a mediator-less electrolyte that could lead to the realization of an integrated lab-on-chip device.

  2. Photoelectrocatalytic degradation of oxalic acid by spray deposited nanocrystalline zinc oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Shinde, S.S. [Electrochemical Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (India); Shinde, P.S. [Department of Nano-Engineering, Kyungnam University, Masan 631-701 (Korea, Republic of); Sapkal, R.T. [Electrochemical Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (India); Oh, Y.W. [Department of Nano-Engineering, Kyungnam University, Masan 631-701 (Korea, Republic of); Haranath, D. [National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi 110 012 (India); Bhosale, C.H. [Electrochemical Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (India); Rajpure, K.Y., E-mail: rajpure@yahoo.com [Electrochemical Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416004 (India)

    2012-10-15

    Highlights: Black-Right-Pointing-Pointer Influence of substrate temperature onto the physico-chemical properties. Black-Right-Pointing-Pointer Photochemical, structural, luminescent, optoelectrical and thermal properties. Black-Right-Pointing-Pointer The kinetics of oxalic acid degradation with reaction mechanism. Black-Right-Pointing-Pointer Extent of mineralization by COD and TOC. - Abstract: The high quality nano-crystalline zinc oxide thin films are deposited onto corning glasses by spray pyrolysis technique. The influence of reaction temperature onto their photoelectrochemical, structural, morphological, optoelectronic, luminescence and thermal properties has been investigated. The structural characteristics studied by X-ray diffractometry has complemented by resistivity measurements and UV-Vis spectroscopy. The photoelectrochemical activity shows enhancement in short circuit current (I{sub sc} = 0.357 mA) and open circuit voltage (V{sub oc} = 0.48 V). Direct band gap calculated by considering R and T values of ZnO thin films increases from 3.14-3.21 eV exhibiting a slight blue shift in band edge. Three characteristic luminescence peaks having near band-edge, blue and green emission are observed in the photoluminescence spectra. The specific heat and thermal conductivity study shows the phonon conduction behavior is dominant in films. Photocatalytic degradation of oxalic acid followed with reaction mechanism by using zinc oxide photoelectrode under solar illumination has been investigated.

  3. Titanium–vanadium oxide nanocomposite thin films: Synthesis, characterization and antibacterial activity

    Energy Technology Data Exchange (ETDEWEB)

    Wren, A.W.; Adams, B.M.; Pradhan, D.; Towler, M.R.; Mellott, N.P., E-mail: mellott@alfred.edu

    2014-04-01

    A sol–gel based deposition method was successfully developed to produce a series of crack-free, spatially homogeneous undoped/silver doped titania–vanadia oxide nanocomposite thin films. Thin films were characterized using Glancing Incidence X-ray Diffraction (GIXRD), X-ray Photoelectron Spectroscopy (XPS), and Ultraviolet Visible Spectroscopy (UV–Vis). It was determined via both XRD and XPS that when calcined at 450 °C the nanocomposite crystallinity was a function of sol composition. Additionally, it was determined via GIXRD that upon silver doping, silver was incorporated into the vanadia structure or present in silver oxide form in crystalline films. A red shift within the UV–Vis spectra was observed with an increase of vanadia concentration from 0 to 100% respectively. Antibacterial analysis conducted on Escherichia coli and Staphylococcus epidermidis demonstrated that films exposed to light showed greater antibacterial properties. - Highlights: • Nanocomposite crystallinity was a function of sol composition. • Silver was incorporated into the vanadia structure. • A red shift was observed with an increase of vanadia concentration. • Antibacterial analysis conducted on Escherichia coli and Staphylococcus epidermidis.

  4. Comment on "Tunable Design of Structural Colors Produced by Pseudo-1D Photonic Crystals of Graphene Oxide" and Thin-Film Interference from Dried Graphene Oxide Film.

    Science.gov (United States)

    Hong, Seung-Ho; Song, Jang-Kun

    2017-04-01

    The mechanism of the iridescent color reflection from dried thin graphene oxide (GO) film on Si wafer is clarified. Dissimilarly to the photonic crystalline reflection in aqueous GO dispersion, the color reflection in dried GO film originates from the thin film interference. The peak reflection can reach 23% by optimizing the GO thickness and the substrate. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  5. Electrical characterization of reduced graphene oxide (rGO) on organic thin film transistor (OTFT)

    Science.gov (United States)

    Musa, Nurhazwani; Halim, Nurul Farhanah Ab.; Ahmad, Mohd Noor; Zakaria, Zulkhairi; Hashim, Uda

    2017-03-01

    A green method and eco-friendly solution were used to chemically reduce graphene oxide (GO) to graphene using green reductant. In this study, graphene oxide (GO) were prepared by using Tours method. Then, reduced graphene oxides (rGO) were prepared by using three typical reduction agents: L-ascorbic acid (L-AA), formamidinesulfinic acid (FAS) and sodium sulfite (Na2SO3). The reduced materials were characterized by Fourier transform infrared spectroscopy (FTIR), Thermo gravimetric analysis (TGA) and X-ray diffraction (XRD). Graphene based organic thin film transistor (G-OTFT) was prepared by a spin coating and thermal evaporation technique. The electrical characterization of G-OTFT was analyzed by using semiconductor parameter analyzer (SPA). The G-OTFT devices show p-type semiconducting behaviour. This article focuses on the synthesis and reduction of graphene oxide using three different reductants in order to maximise its electrical conductivity. The rGO product demonstrated a good electrical conductivity performance with highly sensitivity sensor.

  6. Synergistic approach to high-performance oxide thin film transistors using a bilayer channel architecture.

    Science.gov (United States)

    Yu, Xinge; Zhou, Nanjia; Smith, Jeremy; Lin, Hui; Stallings, Katie; Yu, Junsheng; Marks, Tobin J; Facchetti, Antonio

    2013-08-28

    We report here a bilayer metal oxide thin film transistor concept (bMO TFT) where the channel has the structure: dielectric/semiconducting indium oxide (In2O3) layer/semiconducting indium gallium oxide (IGO) layer. Both semiconducting layers are grown from solution via a low-temperature combustion process. The TFT mobilities of bottom-gate/top-contact bMO TFTs processed at T = 250 °C are ~5tmex larger (~2.6 cm(2)/(V s)) than those of single-layer IGO TFTs (~0.5 cm(2)/(V s)), reaching values comparable to single-layer combustion-processed In2O3 TFTs (~3.2 cm(2)/(V s)). More importantly, and unlike single-layer In2O3 TFTs, the threshold voltage of the bMO TFTs is ~0.0 V, and the current on/off ratio is significantly enhanced to ~1 × 10(8) (vs ~1 × 10(4) for In2O3). The microstructure and morphology of the In2O3/IGO bilayers are analyzed by X-ray diffraction, atomic force microscopy, X-ray photoelectron spectroscopy, and transmission electron microscopy, revealing the polycrystalline nature of the In2O3 layer and the amorphous nature of the IGO layer. This work demonstrates that solution-processed metal oxides can be implemented in bilayer TFT architectures with significantly enhanced performance.

  7. Thermal resistances of crystalline and amorphous few-layer oxide thin films

    Science.gov (United States)

    Chen, Liang; Kumari, Niru; Hou, Yu

    2017-11-01

    Thermal insulation at nanoscale is of crucial importance for non-volatile memory devices such as phase change memory and memristors. We perform non-equilibrium molecular dynamics simulations to study the effects of interface materials and structures on thermal transport across the few-layer dielectric nanostructures. The thermal resistance across few-layer nanostructures and thermal boundary resistance at interfaces consisting of SiO2/HfO2, SiO2/ZrO2 or SiO2/Al2O3 are obtained for both the crystalline and amorphous structures. Based on the comparison temperature profiles and phonon density of states, we show that the thermal boundary resistances are much larger in crystalline few-layer oxides than the amorphous ones due to the mismatch of phonon density of state between distinct oxide layers. Compared with the bulk SiO2, the increase of thermal resistance across crystalline few-layer oxides results from the thermal boundary resistance while the increase of thermal resistance across amorphous few-layer oxides is attributed to the lower thermal conductivity of the amorphous thin films.

  8. Sol-gel deposited aluminum-doped and gallium-doped zinc oxide thin-film transparent conductive electrodes with a protective coating of reduced graphene oxide

    Science.gov (United States)

    Zhu, Zhaozhao; Mankowski, Trent; Balakrishnan, Kaushik; Shikoh, Ali Sehpar; Touati, Farid; Benammar, Mohieddine A.; Mansuripur, Masud; Falco, Charles M.

    2016-04-01

    Using a traditional sol-gel deposition technique, we successfully fabricated aluminum-doped zinc oxide (AZO) and gallium-doped zinc oxide (GZO) thin films on glass substrates. Employing a plasma treatment method as the postannealing process, we produced thin-film transparent conductive electrodes exhibiting excellent optical and electrical properties, with transmittance greater than 90% across the entire visible spectrum and the near-infrared range, as well as good sheet resistance under 200 Ω/sq. More importantly, to improve the resilience of our fabricated thin-film samples at elevated temperatures and in humid environments, we deposited a layer of reduced graphene oxide (rGO) as protective overcoating. The stability of our composite AZO/rGO and GZO/rGO samples improved substantially compared to that of their counterparts with no rGO coating.

  9. Oxidatively Electrodeposited Thin-Film Transition Metal (Oxy)hydroxides as Oxygen Evolution Catalysts.

    Science.gov (United States)

    Morales-Guio, Carlos G; Liardet, Laurent; Hu, Xile

    2016-07-20

    The electrolysis of water to produce hydrogen and oxygen is a simple and attractive approach to store renewable energies in the form of chemical fuels. The oxygen evolution reaction (OER) is a complex four-electron process that constitutes the most energy-inefficient step in water electrolysis. Here we describe a novel electrochemical method for the deposition of a family of thin-film transition metal (oxy)hydroxides as OER catalysts. The thin films have nanodomains of crystallinity with lattice spacing similar to those of double-layered hydroxides. The loadings of these thin-film catalysts were accurately determined with a resolution of below 1 μg cm(-2) using an electrochemical quartz microcrystal balance. The loading-activity relations for various catalysts were established using voltammetry and impedance spectroscopy. The thin-film catalysts have up to four types of loading-activity dependence due to film nucleation and growth as well as the resistance of the films. A zone of intrinsic activity has been identified for all of the catalysts where the mass-averaged activity remains constant while the loading is increased. According to their intrinsic activities, the metal oxides can be classified into three categories: NiOx, MnOx, and FeOx belong to category I, which is the least active; CoOx and CoNiOx belong to category II, which has medium activity; and FeNiOx, CoFeOx, and CoFeNiOx belong to category III, which is the most active. The high turnover frequencies of CoFeOx and CoFeNiOx at low overpotentials and the simple deposition method allow the fabrication of high-performance anode electrodes coated with these catalysts. In 1 M KOH and with the most active electrode, overpotentials as low as 240 and 270 mV are required to reach 10 and 100 mA cm(-2), respectively.

  10. Low Temperature Annealed Zinc Oxide Nanostructured Thin Film-Based Transducers: Characterization for Sensing Applications

    Science.gov (United States)

    Haarindraprasad, R.; Hashim, U.; Gopinath, Subash C. B.; Kashif, Mohd; Veeradasan, P.; Balakrishnan, S. R.; Foo, K. L.; Poopalan, P.

    2015-01-01

    The performance of sensing surfaces highly relies on nanostructures to enhance their sensitivity and specificity. Herein, nanostructured zinc oxide (ZnO) thin films of various thicknesses were coated on glass and p-type silicon substrates using a sol-gel spin-coating technique. The deposited films were characterized for morphological, structural, and optoelectronic properties by high-resolution measurements. X-ray diffraction analyses revealed that the deposited films have a c-axis orientation and display peaks that refer to ZnO, which exhibits a hexagonal structure with a preferable plane orientation (002). The thicknesses of ZnO thin films prepared using 1, 3, 5, and 7 cycles were measured to be 40, 60, 100, and 200 nm, respectively. The increment in grain size of the thin film from 21 to 52 nm was noticed, when its thickness was increased from 40 to 200 nm, whereas the band gap value decreased from 3.282 to 3.268 eV. Band gap value of ZnO thin film with thickness of 200 nm at pH ranging from 2 to 10 reduces from 3.263eV to 3.200 eV. Furthermore, to evaluate the transducing capacity of the ZnO nanostructure, the refractive index, optoelectric constant, and bulk modulus were analyzed and correlated. The highest thickness (200 nm) of ZnO film, embedded with an interdigitated electrode that behaves as a pH-sensing electrode, could sense pH variations in the range of 2-10. It showed a highly sensitive response of 444 μAmM-1cm-2 with a linear regression of R2 =0.9304. The measured sensitivity of the developed device for pH per unit is 3.72μA/pH. PMID:26167853

  11. Low Temperature Annealed Zinc Oxide Nanostructured Thin Film-Based Transducers: Characterization for Sensing Applications.

    Science.gov (United States)

    Haarindraprasad, R; Hashim, U; Gopinath, Subash C B; Kashif, Mohd; Veeradasan, P; Balakrishnan, S R; Foo, K L; Poopalan, P

    2015-01-01

    The performance of sensing surfaces highly relies on nanostructures to enhance their sensitivity and specificity. Herein, nanostructured zinc oxide (ZnO) thin films of various thicknesses were coated on glass and p-type silicon substrates using a sol-gel spin-coating technique. The deposited films were characterized for morphological, structural, and optoelectronic properties by high-resolution measurements. X-ray diffraction analyses revealed that the deposited films have a c-axis orientation and display peaks that refer to ZnO, which exhibits a hexagonal structure with a preferable plane orientation (002). The thicknesses of ZnO thin films prepared using 1, 3, 5, and 7 cycles were measured to be 40, 60, 100, and 200 nm, respectively. The increment in grain size of the thin film from 21 to 52 nm was noticed, when its thickness was increased from 40 to 200 nm, whereas the band gap value decreased from 3.282 to 3.268 eV. Band gap value of ZnO thin film with thickness of 200 nm at pH ranging from 2 to 10 reduces from 3.263eV to 3.200 eV. Furthermore, to evaluate the transducing capacity of the ZnO nanostructure, the refractive index, optoelectric constant, and bulk modulus were analyzed and correlated. The highest thickness (200 nm) of ZnO film, embedded with an interdigitated electrode that behaves as a pH-sensing electrode, could sense pH variations in the range of 2-10. It showed a highly sensitive response of 444 μAmM-1cm-2 with a linear regression of R2 =0.9304. The measured sensitivity of the developed device for pH per unit is 3.72μA/pH.

  12. Low Temperature Annealed Zinc Oxide Nanostructured Thin Film-Based Transducers: Characterization for Sensing Applications.

    Directory of Open Access Journals (Sweden)

    R Haarindraprasad

    Full Text Available The performance of sensing surfaces highly relies on nanostructures to enhance their sensitivity and specificity. Herein, nanostructured zinc oxide (ZnO thin films of various thicknesses were coated on glass and p-type silicon substrates using a sol-gel spin-coating technique. The deposited films were characterized for morphological, structural, and optoelectronic properties by high-resolution measurements. X-ray diffraction analyses revealed that the deposited films have a c-axis orientation and display peaks that refer to ZnO, which exhibits a hexagonal structure with a preferable plane orientation (002. The thicknesses of ZnO thin films prepared using 1, 3, 5, and 7 cycles were measured to be 40, 60, 100, and 200 nm, respectively. The increment in grain size of the thin film from 21 to 52 nm was noticed, when its thickness was increased from 40 to 200 nm, whereas the band gap value decreased from 3.282 to 3.268 eV. Band gap value of ZnO thin film with thickness of 200 nm at pH ranging from 2 to 10 reduces from 3.263eV to 3.200 eV. Furthermore, to evaluate the transducing capacity of the ZnO nanostructure, the refractive index, optoelectric constant, and bulk modulus were analyzed and correlated. The highest thickness (200 nm of ZnO film, embedded with an interdigitated electrode that behaves as a pH-sensing electrode, could sense pH variations in the range of 2-10. It showed a highly sensitive response of 444 μAmM-1cm-2 with a linear regression of R2 =0.9304. The measured sensitivity of the developed device for pH per unit is 3.72μA/pH.

  13. Controllable Electrochemical Synthesis of Reduced Graphene Oxide Thin-Film Constructed as Efficient Photoanode in Dye-Sensitized Solar Cells

    OpenAIRE

    Soon Weng Chong; Chin Wei Lai; Sharifah Bee Abd Hamid

    2016-01-01

    A controllable electrochemical synthesis to convert reduced graphene oxide (rGO) from graphite flakes was introduced and investigated in detail. Electrochemical reduction was used to prepare rGO because of its cost effectiveness, environmental friendliness, and ability to produce rGO thin films in industrial scale. This study aimed to determine the optimum applied potential for the electrochemical reduction. An applied voltage of 15 V successfully formed a uniformly coated rGO thin film, whic...

  14. Submonolayer nucleation and growth and the initial stage of multilayer kinetic roughening during Ag/Ag (100) homoepitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, C.

    1996-08-01

    A comprehensive Scanning Tunneling Microscopy (STM) study of submonolayer nucleation and growth of 2D islands in Ag/Ag(100) homoepitaxy for temperature between 295K and 370K is presented. The initial stages of multilayer kinetic roughening is also studied. Analysis of an appropriate model for metal (100) homoepitaxy, produces estimates of 350 meV for the terrace diffusion barrier, 400 meV for the adatom bond energy, and 25 meV for the additional Ehrlich-Schwoebel step-edge barrier.

  15. Metal-insulator transition in tin doped indium oxide (ITO) thin films: Quantum correction to the electrical conductivity

    OpenAIRE

    Deepak Kumar Kaushik; K. Uday Kumar; Subrahmanyam, A

    2017-01-01

    Tin doped indium oxide (ITO) thin films are being used extensively as transparent conductors in several applications. In the present communication, we report the electrical transport in DC magnetron sputtered ITO thin films (prepared at 300 K and subsequently annealed at 673 K in vacuum for 60 minutes) in low temperatures (25-300 K). The low temperature Hall effect and resistivity measurements reveal that the ITO thin films are moderately dis-ordered (kFl∼1; kF is the Fermi wave vector and l ...

  16. Dataset on electro-optically tunable smart-supercapacitors based on oxygen-excess nanograin tungsten oxide thin film

    Directory of Open Access Journals (Sweden)

    Akbar I. Inamdar

    2017-10-01

    Full Text Available The dataset presented here is related to the research article entitled “Highly Efficient Electro-optically Tunable Smart-supercapacitors Using an Oxygen-excess Nanograin Tungsten Oxide Thin Film” (Akbar et al., 2017 [9] where we have presented a nanograin WO3 film as a bifunctional electrode for smart supercapacitor devices. In this article we provide additional information concerning nanograin tungsten oxide thin films such as atomic force microscopy, Raman spectroscopy, and X-ray diffraction spectroscopy. Moreover, their electrochemical properties such as cyclic voltammetry, electrochemical supercapacitor properties, and electrochromic properties including coloration efficiency, optical modulation and electrochemical impedance spectroscopy are presented.

  17. Thermally evaporated mechanically hard tin oxide thin films for opto-electronic apllications

    Energy Technology Data Exchange (ETDEWEB)

    Tripathy, Sumanta K.; Rajeswari, V. P. [Centre for Nano Science and Technology, GVP College of Engineering (Autonomous), Visakhapatnam- 530048 (India)

    2014-01-28

    Tungsten doped tin oxide (WTO) and Molybdenum doped tin oxide (MoTO) thin film were deposited on corn glass by thermal evaporation method. The films were annealed at 350°C for one hour. Structural analysis using Xray diffraction data shows both the films are polycrystalline in nature with monoclinic structure of tin oxide, Sn{sub 3}O{sub 4}, corresponding to JCPDS card number 01-078-6064. SEM photograph showed that both the films have spherical grains with size in the range of 20–30 nm. Compositional analysis was carried out using EDS which reveals the presence of Sn, O and the dopant Mo/W only thereby indicating the absence of any secondary phase in the films. The films are found to contain nearly 6 wt% of Mo, 8 wt% of W as dopants respectively. The transmission pattern for both the films in the spectral range 200 – 2000 nm shows that W doping gives a transparency of nearly 80% from 380 nm onwards while Mo doping has less transparency of 39% at 380nm. Film hardness measurement using Triboscope shows a film hardness of about 9–10 GPa for both the films. It indicates that W or M doping in tin oxide provides the films the added advantage of withstanding the mechanical wear and tear due to environmental fluctuations By optimizing the optical and electrical properties, W/Mo doped tin oxide films may be explored as window layers in opto-electronic applications such as solar cells.

  18. Highly conductive homoepitaxial Si-doped Ga2O3 films on (010) β-Ga2O3 by pulsed laser deposition

    Science.gov (United States)

    Leedy, Kevin D.; Chabak, Kelson D.; Vasilyev, Vladimir; Look, David C.; Boeckl, John J.; Brown, Jeff L.; Tetlak, Stephen E.; Green, Andrew J.; Moser, Neil A.; Crespo, Antonio; Thomson, Darren B.; Fitch, Robert C.; McCandless, Jonathan P.; Jessen, Gregg H.

    2017-07-01

    Si-doped Ga2O3 thin films were fabricated by pulsed laser deposition on semi-insulating (010) β-Ga2O3 and (0001) Al2O3 substrates. Films deposited on β-Ga2O3 showed single crystal, homoepitaxial growth as determined by high resolution transmission electron microscopy and x-ray diffraction. Corresponding films deposited on Al2O3 were mostly single phase, polycrystalline β-Ga2O3 with a preferred (20 1 ¯ ) orientation. An average conductivity of 732 S cm-1 with a mobility of 26.5 cm2 V-1 s-1 and a carrier concentration of 1.74 × 1020 cm-3 was achieved for films deposited at 550 °C on β-Ga2O3 substrates as determined by Hall-Effect measurements. Two orders of magnitude improvement in conductivity were measured using native substrates versus Al2O3. A high activation efficiency was obtained in the as-deposited condition. The high carrier concentration Ga2O3 thin films achieved by pulsed laser deposition enable application as a low resistance ohmic contact layer in β-Ga2O3 devices.

  19. Annealing effect on physical properties of evaporated molybdenum oxide thin films for ethanol sensing

    Energy Technology Data Exchange (ETDEWEB)

    Touihri, S., E-mail: s_touihri@yahoo.fr [Unité de Physique des Dispositifs a semi-conducteurs, Faculté des sciences de Tunis, Tunis El Manar University, 2092 Tunis (Tunisia); Arfaoui, A.; Tarchouna, Y. [Unité de Physique des Dispositifs a semi-conducteurs, Faculté des sciences de Tunis, Tunis El Manar University, 2092 Tunis (Tunisia); Labidi, A. [Laboratoire Matériaux, Molécules et Applications, IPEST, BP 51 La Marsa 2070, Tunis (Tunisia); Amlouk, M. [Unité de Physique des Dispositifs a semi-conducteurs, Faculté des sciences de Tunis, Tunis El Manar University, 2092 Tunis (Tunisia); Bernede, J.C. [LUNAM, Universite de Nantes, Moltech Anjou, CNRS, UMR 6200, FSTN, 2 Rue de la houssiniere, BP 92208, Nantes F-44322 (France)

    2017-02-01

    Highlights: • Thermally grown molybdenum oxide films are amorphous, oxygen deficient and gas sensing. • Air or vacuum annealing transforms them into a sub-stoichiometric MoO{sub 3−x} phase. • The samples annealed at 500 °C in oxygen were crystallized and identified as pure orthorhombic MoO{sub 3} phase. • The conduction process and sensing mechanism of MoO{sub 3-x} to ethanol have been studied. - Abstract: This paper deals with some physical investigations on molybdenum oxide thin films growing on glass substrates by the thermal evaporation method. These films have been subjected to an annealing process under vacuum, air and oxygen at various temperatures 673, 723 and 773 K. First, the physical properties of these layers were analyzed by means of X-ray diffraction, Raman spectroscopy, scanning electron microscopy (SEM) and optical measurements. These techniques have been used to investigate the oxygen index in MoO{sub x} properties during the heat treatment. Second, from the reflectance and transmittance optical measurements, it was found that the direct band gap energy value increased from 3.16 to 3.90 eV. Finally, the heat treatments reveal that the oxygen index varies in such molybdenum oxides showing noticeably sensitivity toward ethanol gas.

  20. High Performance, Low Temperature Solution-Processed Barium and Strontium Doped Oxide Thin Film Transistors.

    Science.gov (United States)

    Banger, Kulbinder K; Peterson, Rebecca L; Mori, Kiyotaka; Yamashita, Yoshihisa; Leedham, Timothy; Sirringhaus, Henning

    2014-01-28

    Amorphous mixed metal oxides are emerging as high performance semiconductors for thin film transistor (TFT) applications, with indium gallium zinc oxide, InGaZnO (IGZO), being one of the most widely studied and best performing systems. Here, we investigate alkaline earth (barium or strontium) doped InBa(Sr)ZnO as alternative, semiconducting channel layers and compare their performance of the electrical stress stability with IGZO. In films fabricated by solution-processing from metal alkoxide precursors and annealed to 450 °C we achieve high field-effect electron mobility up to 26 cm(2) V(-1) s(-1). We show that it is possible to solution-process these materials at low process temperature (225-200 °C yielding mobilities up to 4.4 cm(2) V(-1) s(-1)) and demonstrate a facile "ink-on-demand" process for these materials which utilizes the alcoholysis reaction of alkyl metal precursors to negate the need for complex synthesis and purification protocols. Electrical bias stress measurements which can serve as a figure of merit for performance stability for a TFT device reveal Sr- and Ba-doped semiconductors to exhibit enhanced electrical stability and reduced threshold voltage shift compared to IGZO irrespective of the process temperature and preparation method. This enhancement in stability can be attributed to the higher Gibbs energy of oxidation of barium and strontium compared to gallium.

  1. The complex interface chemistry of thin-film silicon/zinc oxide solar cell structures.

    Science.gov (United States)

    Gerlach, D; Wimmer, M; Wilks, R G; Félix, R; Kronast, F; Ruske, F; Bär, M

    2014-12-21

    The interface between solid-phase crystallized phosphorous-doped polycrystalline silicon (poly-Si(n(+))) and aluminum-doped zinc oxide (ZnO:Al) was investigated using spatially resolved photoelectron emission microscopy. We find the accumulation of aluminum in the proximity of the interface. Based on a detailed photoemission line analysis, we also suggest the formation of an interface species. Silicon suboxide and/or dehydrated hemimorphite have been identified as likely candidates. For each scenario a detailed chemical reaction pathway is suggested. The chemical instability of the poly-Si(n(+))/ZnO:Al interface is explained by the fact that SiO2 is more stable than ZnO and/or that H2 is released from the initially deposited a-Si:H during the crystallization process. As a result, Zn (a deep acceptor in silicon) is "liberated" close to the silicon/zinc oxide interface presenting the inherent risk of forming deep defects in the silicon absorber. These could act as recombination centers and thus limit the performance of silicon/zinc oxide based solar cells. Based on this insight some recommendations with respect to solar cell design, material selection, and process parameters are given for further knowledge-based thin-film silicon device optimization.

  2. Complementary Circuit with Self-Alignment Organic/Oxide Thin-Film Transistors

    Science.gov (United States)

    Takeda, Fumio; Sato, Ryuichi; Naka, Shigeki; Okada, Hiroyuki

    2012-02-01

    Complementary logic circuits with self-alignment organic/oxide thin-film transistors (TFTs) were investigated. The layout and process steps of a self-alignment bottom-contact-type organic TFT and a top-contact type oxide TFT with a common layout pattern of the gate, source, and drain electrodes were proposed, and an integrated circuit was realized. The estimated field-effect mobilities, threshold voltages, and on-off ratios of the organic and oxide TFTs were 0.16 and 2.2 cm2 V-1 s-1, 2.2 and 2 V, and 3×103 and 5.2×106, respectively. From the complementary inverter characteristics, the voltage gain was 13 and the logic swing was 9.8 V at an applied voltage of 10 V. From the switching characteristics of the inverter, the rise and fall times were 18 and 46 µs, respectively. The operations of the NAND and NOR logic circuit configurations were confirmed, and the maximum operational frequency of NAND logic was estimated to be over 100 kHz.

  3. Understanding and Enhancing the Photostability of Nanoporous Metal Oxide Thin Films for Solar Hydrogen Generation

    Science.gov (United States)

    Chitrada, Kalyan Chakravarthi

    under dark conditions. The binary bismuth (III) oxide, in spite being a good photocatalytic material, did not receive as much attention as other bismuth based ternary oxides for photoelectrochemical water splitting application. In this present study, large surface area nanoporous bismuth oxide thin films were synthesized by the electrochemical anodization. These anodic oxides exhibited a dual layered structure having a planar inner oxide and nanoporous outer oxide. Effect of the nanoscale dimensions of the oxides on the photoelectrochemical behavior was studied to understand the charge transport, charge recombination behavior, and long term stability of the material. A maximum photo current density of 0.97 mA/cm2 was observed for the sample anodized at 10 V at 1.53 VRHE. The nanoporous anodic oxides showed a charge carrier density in the range of 1.2 x 1017 -- 4.8 x 1018 cm-3 without illumination and about 60% increase in the charge carrier density upon illumination. However a decay in photo current was observed for the bismuth oxide samples was due to accumulation of holes on the electrode surface. This hole-accumulation was mitigated by the addition of hole scavengers. Addition of hydrogen peroxide as hole scavenger increased the photo current density by about 4 times in 0.5 M Na2SO 4 (pH: 5.8) electrolyte. Addition of H2O2 in 1 M KOH (pH: 13.7) showed an increase-decrease behavior and high photo current density of ~10 mA/cm2 at a bias potential of 0.65 VRHE . The high photo activity observed in this electrolyte was attributed to the in-situ formation of Bi2O4-x phase by the photo-conversion of the beta-Bi2O3 at the surface. The photo-converted Bi2O4-x has a smaller band gap (1.4 eV) and therefore harvested more light in the visible region. This in-situ formation of low band gap phases in the presence of H2O2 during solar water splitting is an interesting observation which has been reported for the first time and this will help design material with very high photo-activity.

  4. Pulsed DC reactively sputtered tantalum oxide thin films for embedded capacitors

    Science.gov (United States)

    Jain, Pushkar

    Embedded capacitor technology, where thin film capacitors are integrated at on-chip and/or off-chip levels, offers high packaging densities and improved electrical performance at potentially reduced costs of capacitor fabrication and integration. This research explores and establishes the leverages of using thin film embedded capacitors over currently used surface mount discrete capacitors. In particular, this thesis focuses on developing pulsed dc reactively sputtered tantalum oxide (Ta2O5) thin film capacitors to be integrated into established interconnect technologies of IC chips and packages. A correlation between electrical breakdown field and dielectric constant, EBR (MV/cm) = (20/ 3r ) is empirically determined and used to establish a design space for breakdown voltage and capacitance density of planar capacitors, with film thickness and material dielectric constant as parameters. This design space sets the limits for "best one can achieve" (BOCA) breakdown voltages and capacitance densities using a particular dielectric. The validity of the developed design space is experimentally verified with Ta2O 5 thin films over a wide range of film thickness (0.05 to 5.4 mum). High frequency test vehicles were designed and fabricated to evaluate the electrical performance of Ta2O5, SiO 2, and Si3N4 thin film capacitors over a wide range of frequencies (dc to 20 GHz). Ta2O5, SiO 2, and Si3N4 show no dispersion at least up to 20 GHz. The total inductance of power connect vias is determined to be less than 50 pH/mum of via, which is at least two orders of magnitude lower than most discrete capacitors along with connection leads (>4 nH). The extent of Cu diffusion/drift into Ta2O5 films is determined and compared with Al, Ta, and Ti at various biasing and temperature conditions using bias-temperature-stress (BTS) and triangular voltage sweep (TVS) techniques. No Cu diffusion was detected at 150°C at least till 0.75 MV/cm. (Abstract shortened by UMI.)

  5. Integration of Multi-Functional Oxide Thin Film Heterostructures with III-V Semiconductors

    Science.gov (United States)

    Rahman, Md. Shafiqur

    Integration of multi-functional oxide thin films with semiconductors has attracted considerable attention in recent years due to their potential applications in sensing and logic functionalities that can be incorporated in future system-on-a-chip devices. III-V semiconductor, for example, GaAs, have higher saturated electron velocity and mobility allowing transistors based on GaAs to operate at a much higher frequency with less noise compared to Si. In addition, because of its direct bandgap a number of efficient optical devices are possible and by oxide integrating with other III-V semiconductors the wavelengths can be made tunable through hetero-engineering of the bandgap. This study, based on the use of SrTiO3 (STO) films grown on GaAs (001) substrates by molecular beam epitaxy (MBE) as an intermediate buffer layer for the hetero-epitaxial growth of ferromagnetic La0.7Sr 0.3MnO3 (LSMO) and room temperature multiferroic BiFeO 3 (BFO) thin films and superlattice structures using pulsed laser deposition (PLD). The properties of the multilayer thin films in terms of growth modes, lattice spacing/strain, interface structures and texture were characterized by the in-situ reflection high energy electron diffraction (RHEED). The crystalline quality and chemical composition of the complex oxide heterostructures were investigated by a combination of X-ray diffraction (XRD) and X-ray photoelectron absorption spectroscopy (XPS). Surface morphology, piezo-response with domain structure, and ferroelectric switching observations were carried out on the thin film samples using a scanning probe microscope operated as a piezoresponse force microscopy (PFM) in the contact mode. The magnetization measurements with field cooling exhibit a surprising increment in magnetic moment with enhanced magnetic hysteresis squareness. This is the effect of exchange interaction between the antiferromagnetic BFO and the ferromagnetic LSMO at the interface. The integration of BFO materials with

  6. Effect of native oxide layers on copper thin-film tensile properties: A reactive molecular dynamics study

    Energy Technology Data Exchange (ETDEWEB)

    Skarlinski, Michael D., E-mail: michael.skarlinski@rochester.edu [Materials Science Program, University of Rochester, Rochester, New York 14627 (United States); Quesnel, David J. [Materials Science Program, University of Rochester, Rochester, New York 14627 (United States); Department of Mechanical Engineering, University of Rochester, Rochester, New York 14627 (United States)

    2015-12-21

    Metal-oxide layers are likely to be present on metallic nano-structures due to either environmental exposure during use, or high temperature processing techniques such as annealing. It is well known that nano-structured metals have vastly different mechanical properties from bulk metals; however, difficulties in modeling the transition between metallic and ionic bonding have prevented the computational investigation of the effects of oxide surface layers. Newly developed charge-optimized many body [Liang et al., Mater. Sci. Eng., R 74, 255 (2013)] potentials are used to perform fully reactive molecular dynamics simulations which elucidate the effects that metal-oxide layers have on the mechanical properties of a copper thin-film. Simulated tensile tests are performed on thin-films while using different strain-rates, temperatures, and oxide thicknesses to evaluate changes in yield stress, modulus, and failure mechanisms. Findings indicate that copper-thin film mechanical properties are strongly affected by native oxide layers. The formed oxide layers have an amorphous structure with lower Cu-O bond-densities than bulk CuO, and a mixture of Cu{sub 2}O and CuO charge character. It is found that oxidation will cause modifications to the strain response of the elastic modulii, producing a stiffened modulii at low temperatures (<75 K) and low strain values (<5%), and a softened modulii at higher temperatures. While under strain, structural reorganization within the oxide layers facilitates brittle yielding through nucleation of defects across the oxide/metal interface. The oxide-free copper thin-film yielding mechanism is found to be a tensile-axis reorientation and grain creation. The oxide layers change the observed yielding mechanism, allowing for the inner copper thin-film to sustain an FCC-to-BCC transition during yielding. The mechanical properties are fit to a thermodynamic model based on classical nucleation theory. The fit implies that the oxidation of the

  7. Effects of Thermal Annealing on the Optical Properties of Titanium Oxide Thin Films Prepared by Chemical Bath Deposition Technique

    OpenAIRE

    H.U. Igwe; O.E. Ekpe; E.I. Ugwu

    2010-01-01

    A titanium oxide thin film was prepared by chemical bath deposition technique, deposited on glass substrates using TiO2 and NaOH solution with triethanolamine (TEA) as the complexing agent. The films w ere subjected to post deposition annealing under various temperatures, 100, 150, 200, 300 and 399ºC. The thermal treatment streamlined the properties of the oxide films. The films are transparent in the entire regions of the electromagnetic spectrum, firmly adhered to the substrate and resistan...

  8. ZnTe thin films grown by electrodeposition technique on Fluorine Tin Oxide substrates

    Energy Technology Data Exchange (ETDEWEB)

    Skhouni, O. [Laboratoire LOAOS, Département de Physique, Université Hassan II, Faculté des Sciences et Techniques, Bd Yasmina, BP 145 Mohammedia (Morocco); El Manouni, A. [Departament de Física Aplicada-ETSED, Universitat Politècnica de València, Camí de Vera s/n, 46022 Valencia (Spain); Laboratoire LOAOS, Département de Physique, Université Hassan II, Faculté des Sciences et Techniques, Bd Yasmina, BP 145 Mohammedia (Morocco); Mollar, M. [Departament de Física Aplicada-ETSED, Universitat Politècnica de València, Camí de Vera s/n, 46022 Valencia (Spain); Schrebler, R. [Instituto de Química, Facultad de Ciencias, Pontificia Universidad Católica de Valparaíso, Av. Universidad 330, Curauma Valparaíso (Chile); Marí, B., E-mail: bmari@fis.upv.es [Departament de Física Aplicada-ETSED, Universitat Politècnica de València, Camí de Vera s/n, 46022 Valencia (Spain)

    2014-08-01

    Zinc telluride (ZnTe) thin films are prepared potentiostatically from an aqueous solution bath containing ZnCl{sub 2}, TeCl{sub 4} and LiCl on Fluorine Tin Oxide coated glass substrate to investigate its suitability as a material for solar cell technology. The appropriate potential region where formation of stoichiometric ZnTe semiconductor occurs is found to be close to − 0.85 V versus Ag/AgCl. X-ray diffraction results have indicated that all electrodeposited films have cubic structure. Quantitative analysis of energy dispersive X-ray analysis results has shown that the composition ratio (Zn:Te) of films is around (1:0.99). A direct energy gap of 2.19 eV is determined by NIR–Vis–UV spectroscopy. The effect of annealing on the crystallinity and optical properties has been reported. Impedance measurements have revealed that all grown films present a p-type electrical conductivity with acceptor density N{sub A} = 2.16 × 10{sup 19} cm{sup −3}. Furthermore, the impedance results are adjusted to an equivalent circuit having two capacitors in series (Helmholtz, C{sub H} and space charge, C{sub SC}) and two resistances R{sub CT} and R{sub SC}, which are associated with charge transfer processes. - Highlights: • ZnTe thin films were electrochemically synthetized. • We discuss the electrochemical reactions involved in ZnTe thin film formation. • ZnTe films are p-type semiconductor with acceptor concentration about 2 × 10{sup 19} cm{sup −3}. • EIS data are modeled with a two capacitor–two resistance equivalent circuit. • Faster charge transfer process occurs at the interface ZnTe/electrolitic solution.

  9. Facile synthesis of cobalt-doped zinc oxide thin films for highly efficient visible light photocatalysts

    Energy Technology Data Exchange (ETDEWEB)

    Altintas Yildirim, Ozlem, E-mail: ozlemaltintas@gmail.com [Department of Metallurgical and Materials Engineering, Selcuk University, Konya (Turkey); Arslan, Hanife; Sönmezoğlu, Savaş [Department of Metallurgical and Materials Engineering, Karamanoglu Mehmetbey University, Karaman (Turkey); Nanotechnology R& D Laboratory, Karamanoglu Mehmetbey University, Karaman (Turkey)

    2016-12-30

    Highlights: • Photocatalytically active Co-ZnO thin film was obtained by sol-gel method. • Co{sup 2+} doping narrowed the band gap of pure ZnO to an extent of 3.18 eV. • Co-ZnO was effective in MB degradation under visible light. • Optimum dopant content to show high performance was 3 at.%. - Abstract: Cobalt-doped zinc oxide (Co:ZnO) thin films with dopant contents ranging from 0 to 5 at.% were prepared using the sol–gel method, and their structural, morphological, optical, and photocatalytic properties were characterized. The effect of the dopant content on the photocatalytic properties of the films was investigated by examining the degradation behavior of methylene blue (MB) under visible light irradiation, and a detailed investigation of their photocatalytic activities was performed by determining the apparent quantum yields (AQYs). Co{sup 2+} ions were observed to be substitutionally incorporated into Zn{sup 2+} sites in the ZnO crystal, leading to lattice parameter constriction and band gap narrowing due to the photoinduced carriers produced under the visible light irradiation. Thus, the light absorption range of the Co:ZnO films was improved compared with that of the undoped ZnO film, and the Co:ZnO films exhibited highly efficient photocatalytic activity (∼92% decomposition of MB after 60-min visible light irradiation for the 3 at.% Co:ZnO film). The AQYs of the Co:ZnO films were greatly enhanced under visible light irradiation compared with that of the undoped ZnO thin film, demonstrating the effect of the Co doping level on the photocatalytic activity of the films.

  10. Sol-gel deposition and plasma treatment of intrinsic, aluminum-doped, and gallium-doped zinc oxide thin films as transparent conductive electrodes

    Science.gov (United States)

    Zhu, Zhaozhao; Mankowski, Trent; Balakrishnan, Kaushik; Shikoh, Ali Sehpar; Touati, Farid; Benammar, Mohieddine A.; Mansuripur, Masud; Falco, Charles M.

    2015-09-01

    Zinc oxide and aluminum/gallium-doped zinc oxide thin films were deposited via sol-gel spin-coating technique. Employing plasma treatment as alternative to post thermal annealing, we found that the morphologies of these thin films have changed and the sheet resistances have been significantly enhanced. These plasma-treated thin films also show very good optical properties, with transmittance above 90% averaged over the visible wavelength range. Our best aluminum/gallium-doped zinc oxide thin films exhibit sheet resistances (Rs) of ~ 200 Ω/sq and ~ 150 Ω/sq, respectively.

  11. Structural and Optical Properties of Chemical Bath Deposited Silver Oxide Thin Films: Role of Deposition Time

    Directory of Open Access Journals (Sweden)

    A. C. Nwanya

    2013-01-01

    Full Text Available Silver oxide thin films were deposited on glass substrates at a temperature of 50°C by chemical bath deposition technique under different deposition times using pure AgNO3 precursor and triethanolamine as the complexing agent. The chemical analysis based on EDX technique shows the presence of Ag and O at the appropriate energy levels. The morphological features obtained from SEM showed that the AgxO structures varied as the deposition time changes. The X-ray diffraction showed the peaks of Ag2O and AgO in the structure. The direct band gap and the refractive index increased as the deposition time increased and was in the range of 1.64–1.95 eV and 1.02–2.07, respectively. The values of the band gap and refractive index obtained indicate possible applications in photovoltaic and photothermal systems.

  12. Thin copolymer-cased light-emitting display made with fluorine-foped tin oxide substrates

    Directory of Open Access Journals (Sweden)

    Rudolf Lessmann

    2004-09-01

    Full Text Available Seven-segment displays are used to show numerical quantities in electronic equipment, being present in most of the low-end electronics. In this work we describe a novel organic light emitting display made with poly(1,10 decanedioxy 2 methoxy - 1,2 phenylene - 1,2 ethenylene - 3,6 dimethoxy - 1,4 phenylene - 1,2 ethenylene 3 methoxy - 1,4 - phenylene (OPPVDBC, tris(8-hydroxyquinolinealuminum salt (Alq3 and a hole injection layer (PEDOT:PSS: poly(3,4 - ethylenedioxythiophene : poly(styrenesulfonate. The general device structure is FTO/PEDOT:PSS/OPPVDBC/Ca/Al or FTO/PEDOT:PSS/OPPVDBC/Alq3/Ca/Al. The FTO (fluorine-doped tin oxide thin films are transparent (transmittance > 80 % in the visible region of the spectrum, conductive (< 15 omega/º for 200 nm thick films, and present high chemical stability.

  13. High quality amorphous indium zinc oxide thin films synthesized by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Socol, G., E-mail: gabriel.socol@inflpr.ro [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov (Romania); Craciun, D.; Mihailescu, I.N.; Stefan, N. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov (Romania); Besleaga, C.; Ion, L.; Antohe, S. [University of Bucharest, Faculty of Physics, 405 Atomistilor Str, POB MG-11, Magurele Ilfov 077125 (Romania); Kim, K.W.; Norton, D.; Pearton, S.J. [Materials Science and Engineering, University of Florida, Gainesville (United States); Galca, A.C. [National Institute for Materials Physics, Magurele, Ilfov (Romania); Craciun, V. [National Institute for Lasers, Plasma and Radiation Physics, Magurele, Ilfov (Romania); Materials Science and Engineering, University of Florida, Gainesville (United States)

    2011-12-01

    Indium zinc oxide films were grown from targets with two different In atomic concentration [In/(In + Zn)] of 40% and 80% by the pulsed laser deposition technique on glass substrates from room temperature up to 100 Degree-Sign C. X-ray diffraction and reflectometry investigations showed that films were amorphous and dense. Thin films (thickness < 100 nm) exhibited higher optical transmittance and resistivities than thick films (thickness > 1000 nm), probably caused by a significant decrease of oxygen vacancies due to atmosphere exposure. Films deposited from the In rich target under an oxygen pressure of 1 Pa exhibited optical transmittance higher than 85%, resistivities around 5- 7 Multiplication-Sign 10{sup -4} {Omega} cm and mobilities in the 47-54 cm{sup 2}/V s range.

  14. Indium-Doped Zinc Oxide Thin Films as Effective Anodes of Organic Photovoltaic Devices

    Directory of Open Access Journals (Sweden)

    Ziyang Hu

    2011-01-01

    Full Text Available Indium-doped zinc oxide (IZO thin films were prepared by low-cost ultrasonic spray pyrolysis (USP. Both a low resistivity (3.13×10−3 Ω cm and an average direct transmittance (400∼1500 nm about 80% of the IZO films were achieved. The IZO films were investigated as anodes in bulk-heterojunction organic photovoltaic (OPV devices based on poly(3-hexylthiophene and [6,6]-phenyl C61-butyric acid methyl ester. The device fabricated on IZO film-coated glass substrate showed an open circuit voltage of 0.56 V, a short circuit current of 8.49 mA cm-2, a fill factor of 0.40, and a power conversion efficiency of 1.91%, demonstrating that the IZO films prepared by USP technique are promising low In content and transparent electrode candidates of low-cost OPV devices.

  15. Temperature-dependent optical resonance in a thin-walled tubular oxide microcavity

    Directory of Open Access Journals (Sweden)

    Yangfu Fang

    2017-08-01

    Full Text Available This work proposes a temperature-response capability of optical resonance in tubular optical oxide microcavities. The thin wall thickness with a subwavelength scale enables these microcavities to interact with the environment effectively. By optimization of the geometries and materials, the tubular microcavities can be tuned into temperature-inert in vacuum, and the experiments support this design. The experiments prove the idea of utilizing them as temperature-inert microcavities. Contrary wavelength shifts from previous studies were observed, which can be explained with the theoretical model. Furthermore, the theoretical results of the present work suggest that novel rolled-up microtubes could act as an exceptional optical microcavity for the application in temperature response.

  16. Pyroelectric response in crystalline hafnium zirconium oxide (Hf1-xZrxO2) thin films

    Science.gov (United States)

    Smith, S. W.; Kitahara, A. R.; Rodriguez, M. A.; Henry, M. D.; Brumbach, M. T.; Ihlefeld, J. F.

    2017-02-01

    Pyroelectric coefficients were measured for 20 nm thick crystalline hafnium zirconium oxide (Hf1-xZrxO2) thin films across a composition range of 0 ≤ x ≤ 1. Pyroelectric currents were collected near room temperature under zero applied bias and a sinusoidal oscillating temperature profile to separate the influence of non-pyroelectric currents. The pyroelectric coefficient was observed to correlate with zirconium content, increased orthorhombic/tetragonal phase content, and maximum polarization response. The largest measured absolute value was 48 μCm-2 K-1 for a composition with x = 0.64, while no pyroelectric response was measured for compositions which displayed no remanent polarization (x = 0, 0.91, and 1).

  17. Thin Solid Films Topical Special Issue on ZnO related transparent conductive oxides

    Energy Technology Data Exchange (ETDEWEB)

    Chu, Jinn P.; Endo, Tamio; Ellmer, Klaus; Gessert, Tim; Ginley, David

    2016-04-01

    World-wide research activities on ZnO and related transparent conductive oxides (TCO) in thin film, nanostructured, and multilayered forms are driven by the vast potential of these materials for optoelectronic, microelectronic, and photovoltaic applications. Renewed interest in ZnO applications is partly stimulated by cost reduction in material processing and device development. One of the most important issues is doping and alloying with Al, Ga, In, Sn, etc. in order to tune properties. When highly doped, these materials are used as transparent-conducting contacts on solar cells, as well as in catalytic, spintronic, and surface acoustic wave devices. Film growth conditions, including substrate type and orientation, growth temperature, deposition rate, and ambient atmosphere, all play important roles in determining structural, electrical, magnetic, and optical properties.

  18. Review of flexible and transparent thin-film transistors based on zinc oxide and related materials

    Science.gov (United States)

    Zhang, Yong-Hui; Mei, Zeng-Xia; Liang, Hui-Li; Du, Xiao-Long

    2017-04-01

    Flexible and transparent electronics enters into a new era of electronic technologies. Ubiquitous applications involve wearable electronics, biosensors, flexible transparent displays, radio-frequency identifications (RFIDs), etc. Zinc oxide (ZnO) and relevant materials are the most commonly used inorganic semiconductors in flexible and transparent devices, owing to their high electrical performances, together with low processing temperatures and good optical transparencies. In this paper, we review recent advances in flexible and transparent thin-film transistors (TFTs) based on ZnO and relevant materials. After a brief introduction, the main progress of the preparation of each component (substrate, electrodes, channel and dielectrics) is summarized and discussed. Then, the effect of mechanical bending on electrical performance is highlighted. Finally, we suggest the challenges and opportunities in future investigations. Project supported by the National Natural Science Foundation of China (Grants Nos. 61306011, 11274366, 51272280, 11674405, and 11675280).

  19. Physical Properties Investigation of Reduced Graphene Oxide Thin Films Prepared by Material Inkjet Printing

    Directory of Open Access Journals (Sweden)

    Veronika Schmiedova

    2017-01-01

    Full Text Available The article is focused on the study of the optical properties of inkjet-printed graphene oxide (GO layers by spectroscopic ellipsometry. Due to its unique optical and electrical properties, GO can be used as, for example, a transparent and flexible electrode material in organic and printed electronics. Spectroscopic ellipsometry was used to characterize the optical response of the GO layer and its reduced form (rGO, obtainable, for example, by reduction of prepared layers by either annealing, UV radiation, or chemical reduction in the visible range. The thicknesses of the layers were determined by a mechanical profilometer and used as an input parameter for optical modeling. Ellipsometric spectra were analyzed according to the dispersion model and the influence of the reduction of GO on optical constants is discussed. Thus, detailed analysis of the ellipsometric data provides a unique tool for qualitative and also quantitative description of the optical properties of GO thin films for electronic applications.

  20. Translation Effects in Fluorine Doped Tin Oxide Thin Film Properties by Atmospheric Pressure Chemical Vapour Deposition

    Directory of Open Access Journals (Sweden)

    Mohammad Afzaal

    2016-10-01

    Full Text Available In this work, the impact of translation rates in fluorine doped tin oxide (FTO thin films using atmospheric pressure chemical vapour deposition (APCVD were studied. We demonstrated that by adjusting the translation speeds of the susceptor, the growth rates of the FTO films varied and hence many of the film properties were modified. X-ray powder diffraction showed an increased preferred orientation along the (200 plane at higher translation rates, although with no actual change in the particle sizes. A reduction in dopant level resulted in decreased particle sizes and a much greater degree of (200 preferred orientation. For low dopant concentration levels, atomic force microscope (AFM studies showed a reduction in roughness (and lower optical haze with increased translation rate and decreased growth rates. Electrical measurements concluded that the resistivity, carrier concentration, and mobility of films were dependent on the level of fluorine dopant, the translation rate and hence the growth rates of the deposited films.

  1. Structure of a zinc oxide ultra-thin film on Rh(100).

    Science.gov (United States)

    Yuhara, J; Kato, D; Matsui, T; Mizuno, S

    2015-11-07

    The structural parameters of ultra-thin zinc oxide films on Rh(100) are investigated using low-energy electron diffraction intensity (LEED I-V) curves, scanning tunneling microscopy (STM), and first-principles density functional theory (DFT) calculations. From the analysis of LEED I-V curves and DFT calculations, two optimized models A and B are determined. Their structures are basically similar to the planer h-BN ZnO(0001) structure, although some oxygen atoms protrude from the surface, associated with an in-plane shift of Zn atoms. From a comparison of experimental STM images and simulated STM images, majority and minority structures observed in the STM images represent the two optimized models A and B, respectively.

  2. Fabrication and properties of nanocrystalline zinc oxide thin film prepared by sol-gel method

    Directory of Open Access Journals (Sweden)

    Sumetha Suwanboon

    2008-01-01

    Full Text Available Zinc oxide (ZnO thin films were prepared on glass substrate by sol-gel dip-coating method. The structural properties were investigated by x-ray diffraction (XRD method and atomic force microscope (AFM. The optical properties were measured by UV-Vis spectrophotometer. The XRD patterns showed that the films formed preferred orientation along c-axis which increased as a function of polyvinyl pyrrolidone (PVP concentration. The films gave the crystallite size of 15-18 nm calculated by Scherrer’s formula and grain size of 48-70 nm measured by AFM at different PVP concentrations. The direct optical band gap of the films was in the range of 3.80-4.08 eV.

  3. Optical Kerr phase shift in a nanostructured nickel-doped zinc oxide thin solid film.

    Science.gov (United States)

    Torres-Torres, C; Can-Uc, B A; Rangel-Rojo, R; Castañeda, L; Torres-Martínez, R; García-Gil, C I; Khomenko, A V

    2013-09-09

    The optical Kerr effect exhibited by a nickel doped zinc oxide thin solid film was explored with femto- and pico-second pulses using the z-scan method. The samples were prepared by the ultrasonic spray pyrolysis technique. Opposite signs for the value of the nonlinear refractive index were observed in the two experiments. Self-defocusing together with a two-photon absorption process was observed with 120 ps pulses at 1064 nm, while a dominantly self-focusing effect accompanied by saturated absorption was found for 80 fs pulses at 825 nm. Regarding the nanostructured morphology of the resulting film, we attribute the difference in the two ultrafast optical responses to the different physical mechanism responsible of energy transfer generated by multiphoton processes under electronic and thermal effects.

  4. Transient absorption microscopy studies of energy relaxation in graphene oxide thin film

    Science.gov (United States)

    Murphy, Sean; Huang, Libai

    2013-04-01

    Spatial mapping of energy relaxation in graphene oxide (GO) thin films has been imaged using transient absorption microscopy (TAM). Correlated AFM images allow us to accurately determine the thickness of the GO films. In contrast to previous studies, correlated TAM-AFM allows determination of the effect of interactions of GO with the substrate and between stacked GO layers on the relaxation dynamics. Our results show that energy relaxation in GO flakes has little dependence on the substrate, number of stacked layers, and excitation intensity. This is in direct contrast to pristine graphene, where these factors have great consequences in energy relaxation. This suggests intrinsic factors rather than extrinsic ones dominate the excited state dynamics of GO films.

  5. Water-soluble thin film transistors and circuits based on amorphous indium-gallium-zinc oxide.

    Science.gov (United States)

    Jin, Sung Hun; Kang, Seung-Kyun; Cho, In-Tak; Han, Sang Youn; Chung, Ha Uk; Lee, Dong Joon; Shin, Jongmin; Baek, Geun Woo; Kim, Tae-il; Lee, Jong-Ho; Rogers, John A

    2015-04-22

    This paper presents device designs, circuit demonstrations, and dissolution kinetics for amorphous indium-gallium-zinc oxide (a-IGZO) thin film transistors (TFTs) comprised completely of water-soluble materials, including SiNx, SiOx, molybdenum, and poly(vinyl alcohol) (PVA). Collections of these types of physically transient a-IGZO TFTs and 5-stage ring oscillators (ROs), constructed with them, show field effect mobilities (∼10 cm2/Vs), on/off ratios (∼2×10(6)), subthreshold slopes (∼220 mV/dec), Ohmic contact properties, and oscillation frequency of 5.67 kHz at supply voltages of 19 V, all comparable to otherwise similar devices constructed in conventional ways with standard, nontransient materials. Studies of dissolution kinetics for a-IGZO films in deionized water, bovine serum, and phosphate buffer saline solution provide data of relevance for the potential use of these materials and this technology in temporary biomedical implants.

  6. Crystal orientation dependent thermoelectric properties of highly oriented aluminum-doped zinc oxide thin films

    KAUST Repository

    Abutaha, Anas I.

    2013-02-06

    We demonstrate that the thermoelectric properties of highly oriented Al-doped zinc oxide (AZO) thin films can be improved by controlling their crystal orientation. The crystal orientation of the AZO films was changed by changing the temperature of the laser deposition process on LaAlO3 (100) substrates. The change in surface termination of the LaAlO3 substrate with temperature induces a change in AZO film orientation. The anisotropic nature of electrical conductivity and Seebeck coefficient of the AZO films showed a favored thermoelectric performance in c-axis oriented films. These films gave the highest power factor of 0.26 W m−1 K−1 at 740 K.

  7. Nanostructures and thin films of transparent conductive oxides studied by perturbed angular correlations

    CERN Document Server

    Barbosa, M B; Redondo-Cubero, A; Miranda, S M C; Simon, R; Kessler, P; Brandt, M; Henneberger, F; Nogales, E; Méndez, B; Johnston, K; Alves, E; Vianden, R; Araújo, J P; Lorenz, K; Correia, J G

    2013-01-01

    The versatility of perturbed angular correlations (PAC) in the study of nanostructures and thin films is demonstrated, namely for the specific cases of ZnO/Cd$_x$Zn$_{1-x}$O thin films and Ga$_2$O$_3$ powder pellets and nanowires, examples of transparent conductive oxides. PAC measurements as a function of annealing temperature were performed after implantation of $^{111m}$Cd$/^{111}$Cd (T$_{1/2}$=48$\\,$min.) and later compared to density functional theory simulations. For ZnO, the substitution of Cd probes at Zn sites was observed, as well as the formation of a probe-defect complex. The ternary Cd$_x$Zn$_{1-x}$O (x=0.16) showed good macroscopic crystal quality but revealed some clustering of local defects around the probe Cd atoms, which could not be annealed. In the Ga$_2$O$_3$ samples, the substitution of the Cd probes in the octahedral Ga-site was observed, demonstrating the potential of ion-implantation for the doping of nanowires.

  8. Periodic arrays of flux-closure domains in ferroelectric thin films with oxide electrodes

    Science.gov (United States)

    Li, S.; Zhu, Y. L.; Wang, Y. J.; Tang, Y. L.; Liu, Y.; Zhang, S. R.; Ma, J. Y.; Ma, X. L.

    2017-07-01

    Flux-closure domain structures in ferroelectric thin films are considered to have potential applications in electronic devices. It is usually believed that these structures are stabilized by the depolarization field and the contact with electrodes tends to screen the depolarization field and may limit their formation. In this work, the influence of oxide electrodes (SrRuO3 and La0.7Sr0.3MnO3) on the formation of flux-closure domains in PbTiO3 thin films deposited on (110)-oriented GdScO3 substrates by pulsed laser deposition was investigated by Cs-corrected transmission electron microscopy. It is found that periodic flux-closure domain arrays can be stabilized in PbTiO3 films when the top and bottom electrodes are symmetric, while a/c domains appear when asymmetric electrodes are applied. The influence of asymmetric electrodes on the domain configuration is proposed to have a connection with their different work functions and conductivity types. These results are expected to shed light on understanding the nature of flux-closure domains in ferroelectrics and open some research possibilities, such as the evolution of these structures under external electric fields.

  9. Surface modification of thin film composite reverse osmosis membrane by glycerol assisted oxidation with sodium hypochlorite

    Science.gov (United States)

    Raval, Hiren D.; Samnani, Mohit D.; Gauswami, Maulik V.

    2018-01-01

    Need for improvement in water flux of thin film composite (TFC) RO membrane has been appreciated by researchers world over and surface modification approach is found promising to achieve higher water flux and solute rejection. Thin film composite RO membrane was exposed to 2000 mg/l sodium hypochlorite solution with varying concentrations of glycerol ranging from 1 to 10%. It was found that there was a drop in concentration of sodium hypochlorite after the addition of glycerol because of a new compound resulted from the oxidation of glycerol with sodium hypochlorite. The water flux of the membrane treated with 1% glycerol with 2000 mg/l sodium hypochlorite for 1 h was about 22% more and salt rejection was 1.36% greater than that of only sodium hypochlorite treated membrane for the same concentration and time. There was an increase in salt rejection of membrane with increase in concentration of glycerol from 1% to 5%, however, increasing glycerol concentration further up to 10%, the salt rejection declined. The water flux was found declining from 1% glycerol solution to 10% glycerol solution. The membrane samples were characterized to understand the change in chemical structure and morphology of the membrane.

  10. Plasma-treated Langmuir-Blodgett reduced graphene oxide thin film for applications in biophotovoltaics

    Science.gov (United States)

    Ibrahim, Siti Aisyah; Jaafar, Muhammad Musoddiq; Ng, Fong-Lee; Phang, Siew-Moi; Kumar, G. Ghana; Majid, Wan Haliza Abd; Periasamy, Vengadesh

    2018-01-01

    The surface optimization and structural characteristics of Langmuir-Blodgett (LB) reduced graphene oxide thin (rGO) film treated by argon plasma treatment were studied. In this work, six times deposition of rGO was deposited on a clean glass substrate using the LB method. Plasma technique involving a variation of plasma power, i.e., 20, 60, 100 and 140 W was exposed to the LB-rGO thin films under argon ambience. The plasma treatment generally improves the wettability or hydrophilicity of the film surface compared to without treatment. Maximum wettability was observed at a plasma power of 20 W, while also increasing the adhesion of the rGO film with the glass substrate. The multilayer films fabricated were characterized by means of spectroscopic, structural and electrical studies. The treatment of rGO with argon plasma was found to have improved its biocompatibility, and thus its performance as an electrode for biophotovoltaic devices has been shown to be enhanced considerably.

  11. ZnO transparent conductive oxide for thin film silicon solar cells

    Science.gov (United States)

    Söderström, T.; Dominé, D.; Feltrin, A.; Despeisse, M.; Meillaud, F.; Bugnon, G.; Boccard, M.; Cuony, P.; Haug, F.-J.; Faÿ, S.; Nicolay, S.; Ballif, C.

    2010-03-01

    There is general agreement that the future production of electric energy has to be renewable and sustainable in the long term. Photovoltaic (PV) is booming with more than 7GW produced in 2008 and will therefore play an important role in the future electricity supply mix. Currently, crystalline silicon (c-Si) dominates the market with a share of about 90%. Reducing the cost per watt peak and energy pay back time of PV was the major concern of the last decade and remains the main challenge today. For that, thin film silicon solar cells has a strong potential because it allies the strength of c-Si (i.e. durability, abundancy, non toxicity) together with reduced material usage, lower temperature processes and monolithic interconnection. One of the technological key points is the transparent conductive oxide (TCO) used for front contact, barrier layer or intermediate reflector. In this paper, we report on the versatility of ZnO grown by low pressure chemical vapor deposition (ZnO LP-CVD) and its application in thin film silicon solar cells. In particular, we focus on the transparency, the morphology of the textured surface and its effects on the light in-coupling for micromorph tandem cells in both the substrate (n-i-p) and superstrate (p-i-n) configurations. The stabilized efficiencies achieved in Neuchâtel are 11.2% and 9.8% for p-i-n (without ARC) and n-i-p (plastic substrate), respectively.

  12. Bifunctional polydopamine thin film coated zinc oxide nanorods for label-free photoelectrochemical immunoassay.

    Science.gov (United States)

    Yang, Yan; Hu, Weihua

    2017-05-01

    Photoelectrochemical (PEC) detection is a promising method for label-free immunoassay by reporting the specific biological recognition events with electrical signals. However, it is challenging to rationally incorporate immunosensing components with a photocurrent conversion interface, which generally necessitates multistep fabrication and careful tailoring of various components such as photoactive material and biological probe. For high detection reliability and reproducibility, it is highly desirable to rationally construct an efficient PEC interface with architecture as simple as possible. In this work, a novel yet simple PEC immunosensor based on bio-inspired polydopamine (PDA) thin film-coated zinc oxide (ZnO) nanorods was reported. In this PEC immunosensor, the PDA thin film serves simultaneously as a unique sensitizer for charge separation as well as a functional layer for probe antibody attachment. The photocurrent on this electrode under illumination decreases upon the immunoreaction on the surface, possibly due to the blocking effect of formed immunocomplexes on the access of reducing reagent to the photoelectrode, thus offering a simple and reliable platform for PEC label-free immunoassay. By using an antibody-antigen pair as a model, successful label-free immunoassay was achieved with a detection limit of 10pgmL(-1) and a dynamic range from 100pgmL(-1) to 500ngmL(-1). This work demonstrates intriguing electro-optical property and bioconjugation activity of PDA film and may pave the way toward advanced PEC immunoassays. Copyright © 2017 Elsevier B.V. All rights reserved.

  13. Synthesis and characterization of zinc oxide thin films for optoelectronic applications

    Directory of Open Access Journals (Sweden)

    E. Muchuweni

    2017-04-01

    Full Text Available Micro-ring structured zinc oxide (ZnO thin films were prepared on glass substrates by spray pyrolysis and their structural, morphological, optical and electrical properties were investigated. X-ray Diffraction (XRD analysis revealed the films’ hexagonal wurtzite phase with a preferred (002 grain orientation. The mean crystallite size calculated on the basis of the Debye-Scherrer model was 24 nm and a small dislocation density of 1.7×10−3  nm−2 was obtained, indicating the existence of few lattice defects and good crystallinity. Scanning Electron Microscopy (SEM micrographs revealed the film’s granular nature composed of rod-shaped and spherical nanoparticles which agglomerated to form micro-ring like film clusters on the film surface. The average transmittance in the visible region, optical band gap and Urbach energy were approximately 75–80%, 3.28 eV and 57 meV, respectively. The refractive index and extinction coefficient were determined using Swanepoel’s envelope method. Raman spectroscopy revealed the presence of small amounts of residual tensile stress and low density of defects in the ZnO thin films. This was consistent with XRD analysis. A low sheet resistivity (6.03×101  Ωcm and high figure of merit (4.35×10−6  Ω−1 were obtained for our films indicating their suitability in optoelectronic applications.

  14. Thin transparent W-doped indium-zinc oxide (WIZO) layer on glass.

    Science.gov (United States)

    Lee, Young-Jun; Lim, Byung-Wook; Kim, Joo-Hyung; Kim, Tae-Won; Oh, Byeong-Yun; Heo, Gi-Seok; Kim, Kwang-Young

    2012-07-01

    Annealing effect on structural and electrical properties of W-doped IZO (WIZO) films for thin film transistors (TFT) was studied under different process conditions. Thin WIZO films were deposited on glass substrates by RF magnetron co-sputtering technique using indium zinc oxide (10 wt.% ZnO-doped In2O3) and WO3 targets in room temperature. The post annealing temperature was executed from 200 degrees C to 500 degrees C under various O2/Ar ratios. We could not find any big difference from the surface observation of as grown films while it was found that the carrier density and sheet resistance of WIZO films were controlled by O2/Ar ratio and post annealing temperature. Furthermore, the crystallinity of WIZO film was changed as annealing temperature increased, resulting in amorphous structure at the annealing temperature of 200 degrees C, while clear In2O3 peak was observed for the annealed over 300 degrees C. The transmittance of as-grown films over 89% in visible range was obtained. As an active channel layer for TFT, it was found that the variation of resistivity, carrier density and mobility concentration of WIZO film decreased by annealing process.

  15. Synthesis and characterization of zinc oxide thin films for optoelectronic applications.

    Science.gov (United States)

    Muchuweni, E; Sathiaraj, T S; Nyakotyo, H

    2017-04-01

    Micro-ring structured zinc oxide (ZnO) thin films were prepared on glass substrates by spray pyrolysis and their structural, morphological, optical and electrical properties were investigated. X-ray Diffraction (XRD) analysis revealed the films' hexagonal wurtzite phase with a preferred (002) grain orientation. The mean crystallite size calculated on the basis of the Debye-Scherrer model was 24 nm and a small dislocation density of [Formula: see text] was obtained, indicating the existence of few lattice defects and good crystallinity. Scanning Electron Microscopy (SEM) micrographs revealed the film's granular nature composed of rod-shaped and spherical nanoparticles which agglomerated to form micro-ring like film clusters on the film surface. The average transmittance in the visible region, optical band gap and Urbach energy were approximately 75-80%, 3.28 eV and 57 meV, respectively. The refractive index and extinction coefficient were determined using Swanepoel's envelope method. Raman spectroscopy revealed the presence of small amounts of residual tensile stress and low density of defects in the ZnO thin films. This was consistent with XRD analysis. A low sheet resistivity [Formula: see text] and high figure of merit [Formula: see text] were obtained for our films indicating their suitability in optoelectronic applications.

  16. Characterization of iron oxide thin films prepared by sol-gel processing.

    Science.gov (United States)

    Karakuscu, Aylin; Ozenbas, Macit

    2008-02-01

    Iron oxide thin films were prepared by spin-coating a gel solution of iron(III) nitrate dissolved in 2-methoxyethanol and acetylacetone on glass and quartz substrates. The film thickness was adjusted by changing the spinning rate of the spin coater. Annealing was carried out between 300 degrees C to 600 degrees C to investigate the phases present in the films. Viscosity of the main solution was found as 0.0035 Pa.s by viscosity measurement. TGA/DTA analyses showed that heat treatment should be done between 330 degrees C and 440 degrees C in order to produce maghemite thin films. SEM studies showed that single layer thickness of the films were between 65 and 80 nm. The structural characteristics were evaluated by changing the experimental parameters which are annealing temperature, annealing time and thickness of the films. From the X-ray diffraction analysis, maghemite formation was observed with decreasing annealing temperature, annealing time and film thickness. TEM results verified the presence of the maghemite phase by electron diffraction and selected area electron diffraction (SAED) methods. According to UV-Vis results transmittance of the films decreases with increasing annealing temperature.

  17. Synthesis and characterization of nickel oxide thin films deposited on glass substrates using spray pyrolysis

    Energy Technology Data Exchange (ETDEWEB)

    Jlassi, M., E-mail: mohamedjlassilpv@yahoo.fr [Laboratoire de Photovoltaïque, Centre de Recherche et des Technologies de l’Energie, Technopole de Borj-Cédria, BP 95, 2050 Hammam-Lif (Tunisia); Sta, I. [Laboratoire de Photovoltaïque, Centre de Recherche et des Technologies de l’Energie, Technopole de Borj-Cédria, BP 95, 2050 Hammam-Lif (Tunisia); Hajji, M. [Laboratoire de Photovoltaïque, Centre de Recherche et des Technologies de l’Energie, Technopole de Borj-Cédria, BP 95, 2050 Hammam-Lif (Tunisia); Ecole Nationale d’Electronique et des Communications de Sfax, Technopole de Sfax, BP 1163, CP 3021 (Tunisia); Ezzaouia, H. [Laboratoire de Photovoltaïque, Centre de Recherche et des Technologies de l’Energie, Technopole de Borj-Cédria, BP 95, 2050 Hammam-Lif (Tunisia)

    2014-07-01

    A simple and inexpensive spray pyrolysis technique was employed to deposit nickel oxide (NiO) thin films from hydrated nickel chloride salt solution onto amorphous glass substrate. The as-deposited films were transparent, uniform and well adherent to the glass substrate. The effect of the substrate temperature, the volume and the concentration of the sprayed solution on the structural, optical and electrical properties was studied using X-ray diffraction, optical transmittance, four point probe, scanning electron microscopy and atomic force microscopy. The structural analyses show that all the samples have a cubic structure. It was found that the increase in the volume of sprayed solution leads to an increment in the crystallite size of NiO and improves the homogeneity of the film. Optical measurements have shown that an increase in the thickness of the layer results in a decrease in the optical transmission, but it remains higher than 70% even if the thickness exceeds 600 nm. At the same time, the optical gap decreases from 3.7 to 3.55 eV when the thickness increases from 133 to 620 nm. Low values of the electrical resistivity (less than 10 Ω cm) were obtained for thin films with thicknesses less than about 240 nm, but for higher thicknesses the resistivity increases linearly to reach about 170 Ω cm for a thickness of 620 nm.

  18. Preparation, structure and optical properties of transparent conducting gallium-doped zinc oxide thin films

    Directory of Open Access Journals (Sweden)

    Gu J. H.

    2015-09-01

    Full Text Available Highly conductive gallium-doped zinc oxide (GZO transparent thin films were deposited on glass substrates by RF mag­netron sputtering. The deposited films were characterized by X-ray diffraction (XRD, X-ray photoelectron spectroscopy (XPS, four-point probe and UV-Vis spectrophotometer, respectively. The effect of growth temperature on the structure and optoelectrical properties of the films was investigated. The results demonstrate that high quality GZO films oriented with their crystal­lographic c-axis perpendicular to the substrates are obtained. The structure and optoelectrical properties of the films are highly dependent on the growth temperature. It is found that with increasing growth temperature, the average visible transmittance of the deposited films is enhanced and the residual stress in the thin films is obviously relaxed. The GZO films deposited at the growth temperature of 400°C, which have the largest grain size (74.3 nm, the lowest electrical resistivity (1.31×10-3 Ω·cm and the maximum figure of merit (1.46×1O-2Ω-1, exhibit the best optoelectrical properties. Furthermore, the optical proper­ties of the deposited films were determined by the optical characterization methods and the optical energy-gaps were evaluated by extrapolation method. A blue shift of the optical energy gap is observed with an increase in the growth temperature.

  19. Copper Oxide Thin Films through Solution Based Methods for Electrical Energy Conversion and Storage

    Science.gov (United States)

    Zhu, Changqiong

    Copper oxides (Cu2O and CuO), composed of non-toxic and earth abundant elements, are promising materials for electrical energy generation and storage devices. Solution based techniques for creating thin films of these materials, such as electrodeposition, are important to understand and develop because of their potential for realizing substantial energy savings compared to traditional fabrication methods. Cuprous oxide (Cu2O), with its direct band gap, is a p-type semiconductor that is well suited for creating solution-processed photovoltaic devices (solar cells); several key advancements made toward this application are the primary focus of this thesis. Electrodeposition of single-phase, crystalline Cu2O thin films is demonstrated using previously unexplored, acidic lactate/Cu2+ solutions, which has provided additional understanding of the impacts of growth solution chemistry on film formation. The influence of pH on the resulting Cu2O thin film properties is revealed by using the same ligand (sodium lactate) at various solution pH values. Cu2O films grown from acidic lactate solutions can exhibit a distinctive flowerlike, dendritic morphology, in contrast to the faceted, dense films obtained using alkaline lactate solutions. Relative speciation distributions of the various metal complex ions present under different growth conditions are calculated using reported equilibrium association constants and experimentally supported by UV-Visible absorption spectroscopy. Dependence of thin film morphology on the lactate/Cu2+ molar ratio and applied potential is described. Cu2O/eutectic gallium-indium Schottky junction devices are formed and devices are tested under monochromatic green LED illumination. Further surface examination of the Cu2O films using X-ray photoelectron spectroscopy (XPS) reveals the fact that films grown from acidic lactate solution with a small lactate/Cu2+ molar ratio, which exhibit improved photovoltaic performance compared to films grown from

  20. Effects of O{sup 7+} swift heavy ion irradiation on indium oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Gokulakrishnan, V. [Crystal Growth and Thin Film Laboratory, School of Physics, Bharathidasan University, Tiruchirappalli 620024 (India); Parthiban, S. [Crystal Growth and Thin Film Laboratory, School of Physics, Bharathidasan University, Tiruchirappalli 620024 (India); CENIMAT-I3N and CEMOP-UNINOVA, Materials Science Department, FCT-UNL, Caparica Campus, 2829-516 Caparica (Portugal); Elangovan, E. [CENIMAT-I3N and CEMOP-UNINOVA, Materials Science Department, FCT-UNL, Caparica Campus, 2829-516 Caparica (Portugal); Ramamurthi, K., E-mail: krmurthin@yahoo.co.in [Crystal Growth and Thin Film Laboratory, School of Physics, Bharathidasan University, Tiruchirappalli 620024 (India); Jeganathan, K. [Centre for Nanoscience and Nanotechnology, School of Physics, Bharathidasan University, Tiruchirappalli 620024 (India); Kanjilal, D.; Asokan, K. [Inter-University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067 (India); Martins, R.; Fortunato, E. [CENIMAT-I3N and CEMOP-UNINOVA, Materials Science Department, FCT-UNL, Caparica Campus, 2829-516 Caparica (Portugal)

    2011-08-15

    Highlights: {yields} The structural, morphology and electrical properties of indium oxide thin films. {yields} From the XRD, the ion irradiation has changed the preferred orientation from (2 2 2) to (4 0 0). {yields} RMS roughness is significantly reduced to 10 nm for an ion fluency of 1 x 10{sup 13} ions/cm{sup 2}. {yields} The mobility of ion irradiated films (1 x 10{sup 13} ions/cm{sup 2}) is decreased from 76.6 to 43 cm{sup 2}/V s. {yields} The average transmittance (400-2500 nm) of the as-deposited IO film is decreased from 81% to 72% after SHI irradiation. - Abstract: Indium oxide thin films deposited by spray pyrolysis were irradiated by 100 MeV O{sup 7+} ions with different fluences of 5 x 10{sup 11}, 1 x 10{sup 12} and 1 x 10{sup 13} ions/cm{sup 2}. X-ray diffraction analysis confirmed the structure of indium oxide with cubic bixbyite. The strongest (2 2 2) orientation observed from the as-deposited films was shifted to (4 0 0) after irradiation. Furthermore, the intensity of the (4 0 0) orientation was decreased with increasing fluence together with an increase in (2 2 2) intensity. Films irradiated with maximum fluence exhibited an amorphous component. The mobility of the as-deposited indium oxide films was decreased from {approx}78.9 to 43.0 cm{sup 2}/V s, following irradiation. Films irradiated with a fluence of 5 x 10{sup 11} ions/cm{sup 2} showed a better combination of electrical properties, with a resistivity of 4.57 x 10{sup -3} {Omega} cm, carrier concentration of 2.2 x 10{sup 19} cm{sup -3} and mobility of 61.0 cm{sup 2}/V s. The average transmittance obtained from the as-deposited films decreased from {approx}81% to 72%, when irradiated with a fluence of 5 x 10{sup 11} ions/cm{sup 2}. The surface microstructures confirmed that the irregularly shaped grains seen on the surface of the as-deposited films is modified as 'radish-like' morphology when irradiated with a fluence of 5 x 10{sup 11} ions/cm{sup 2}.

  1. Tailored surfaces of perovskite oxide substrates for conducted growth of thin films.

    Science.gov (United States)

    Sánchez, Florencio; Ocal, Carmen; Fontcuberta, Josep

    2014-04-07

    Oxide electronics relies on the availability of epitaxial oxide thin films. The extreme flexibility of the chemical composition of ABO3 perovskites and the broad spectrum of properties they cover, inspire the creativity of scientists and place perovskites in the lead of functional materials for advanced technologies. Moreover, emerging properties are being discovered at interfaces between distinct perovskites that could not be anticipated on the basis of those of the adjacent epitaxial layers. All dreamed new prospects require the use of suitable substrates for epitaxial growth. Perovskite single crystals are the workhorses of this activity and understanding and controlling their surface properties have become critical. In this tutorial review we will chiefly focus on the impact of the morphology and composition of the surface of ABO3 perovskite substrates on the growth mechanisms and properties of thin films epitaxially grown on them. As SrTiO3 is the most popular substrate, we will mostly concentrate on describing the current understanding and achievements for it. Illustrative examples of other perovskite substrates (LaAlO3, LSAT and DyScO3) will be also included. We will show that distinct chemical terminations can exist on the surfaces used for growth and we will review methods employed either to select the most appropriate one for specific growth to allow, for instance, tailoring the ultimate outmost epilayer, or to induce self-ordering to engineer long-range nanoscale patterns of chemical terminations. We will demonstrate the capacity of this knowledge by the growth of low-dimensional organic and inorganic structures.

  2. Zinc oxide epitaxial thin film deposited over carbon on various substrate by pulsed laser deposition technique.

    Science.gov (United States)

    Manikandan, E; Moodley, M K; Sinha Ray, S; Panigrahi, B K; Krishnan, R; Padhy, N; Nair, K G M; Tyagi, A K

    2010-09-01

    Zinc Oxide (ZnO) is a promising candidate material for optical and electronic devices due to its direct wide band gap (3.37 eV) and high exciton binding energy (60 meV). For applications in various fields such as light emitting diode (LED) and laser diodes, growth of p-type ZnO is a prerequisite. ZnO is an intrinsically n-type semiconductor. In this paper we report on the synthesis of Zinc Oxide-Carbon (ZnO:C) thin films using pulsed laser deposition technique (PLD). The deposition parameters were optimized to obtain high quality epitaxial ZnO films over a carbon layer. The structural and optical properties were studied by glazing index X-ray diffraction (GIXRD), photoluminescence (PL), optical absorption (OA), and Raman spectroscopy. Rutherford backscattering spectroscopy (RBS), scanning electron microscopy with energy dispersive spectroscopy (SEMEDS) and atomic force microscopy (AFM) were employed to determine the composition and surface morphology of these thin films. The GIXRD pattern of the synthesized films exhibited hexagonal wurtzite crystal structure with a preferred (002) orientation. PL spectroscopy results showed that the emission intensity was maximum at -380 nm at a deposition temperature of 573 K. In the Raman spectra, the E2 phonon frequency around at 438 cm(-1) is a characteristic peak of the wurtzite lattice and could be seen in all samples. Furthermore, the optical direct band gap of ZnO films was found to be in the visible region. The growth of the epitaxial layer is discussed in the light of carbon atoms from the buffer layer. Our work demonstrates that the carbon is a novel dopant in the group of doped ZnO semiconductor materials. The introduction of carbon impurities enhanced the visible emission of red-green luminescence. It is concluded that the carbon impurities promote the zinc related native defect in ZnO.

  3. Hole mobility modulation of solution-processed nickel oxide thin-film transistor based on high-k dielectric

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Ao; Liu, Guoxia, E-mail: gxliu@qdu.edu.cn, E-mail: fukaishan@yahoo.com; Zhu, Huihui; Shan, Fukai, E-mail: gxliu@qdu.edu.cn, E-mail: fukaishan@yahoo.com [College of Physics, Qingdao University, Qingdao 266071 (China); College of Electronics and Information Engineering, Qingdao University, Qingdao 266071 (China); Lab of New Fiber Materials and Modern Textile, Growing Base for State Key Laboratory, Qingdao University, Qingdao 266071 (China); Shin, Byoungchul [Electronic Ceramics Center, DongEui University, Busan 614-714 (Korea, Republic of); Fortunato, Elvira; Martins, Rodrigo [Department of Materials Science/CENIMAT-I3N, Faculty of Sciences and Technology, New University of Lisbon and CEMOP-UNINOVA, Campus de Caparica, 2829-516 Caparica (Portugal)

    2016-06-06

    Solution-processed p-type oxide semiconductors have recently attracted increasing interests for the applications in low-cost optoelectronic devices and low-power consumption complementary metal-oxide-semiconductor circuits. In this work, p-type nickel oxide (NiO{sub x}) thin films were prepared using low-temperature solution process and integrated as the channel layer in thin-film transistors (TFTs). The electrical properties of NiO{sub x} TFTs, together with the characteristics of NiO{sub x} thin films, were systematically investigated as a function of annealing temperature. By introducing aqueous high-k aluminum oxide (Al{sub 2}O{sub 3}) gate dielectric, the electrical performance of NiO{sub x} TFT was improved significantly compared with those based on SiO{sub 2} dielectric. Particularly, the hole mobility was found to be 60 times enhancement, quantitatively from 0.07 to 4.4 cm{sup 2}/V s, which is mainly beneficial from the high areal capacitance of the Al{sub 2}O{sub 3} dielectric and high-quality NiO{sub x}/Al{sub 2}O{sub 3} interface. This simple solution-based method for producing p-type oxide TFTs is promising for next-generation oxide-based electronic applications.

  4. Controllable Electrochemical Synthesis of Reduced Graphene Oxide Thin-Film Constructed as Efficient Photoanode in Dye-Sensitized Solar Cells.

    Science.gov (United States)

    Chong, Soon Weng; Lai, Chin Wei; Abd Hamid, Sharifah Bee

    2016-01-25

    A controllable electrochemical synthesis to convert reduced graphene oxide (rGO) from graphite flakes was introduced and investigated in detail. Electrochemical reduction was used to prepare rGO because of its cost effectiveness, environmental friendliness, and ability to produce rGO thin films in industrial scale. This study aimed to determine the optimum applied potential for the electrochemical reduction. An applied voltage of 15 V successfully formed a uniformly coated rGO thin film, which significantly promoted effective electron transfer within dye-sensitized solar cells (DSSCs). Thus, DSSC performance improved. However, rGO thin films formed in voltages below or exceeding 15 V resulted in poor DSSC performance. This behavior was due to poor electron transfer within the rGO thin films caused by poor uniformity. These results revealed that DSSC constructed using 15 V rGO thin film exhibited high efficiency (η = 1.5211%) attributed to its higher surface uniformity than other samples. The addition of natural lemon juice (pH ~ 2.3) to the electrolyte accelerated the deposition and strengthened the adhesion of rGO thin film onto fluorine-doped tin oxide (FTO) glasses.

  5. Controllable Electrochemical Synthesis of Reduced Graphene Oxide Thin-Film Constructed as Efficient Photoanode in Dye-Sensitized Solar Cells

    Directory of Open Access Journals (Sweden)

    Soon Weng Chong

    2016-01-01

    Full Text Available A controllable electrochemical synthesis to convert reduced graphene oxide (rGO from graphite flakes was introduced and investigated in detail. Electrochemical reduction was used to prepare rGO because of its cost effectiveness, environmental friendliness, and ability to produce rGO thin films in industrial scale. This study aimed to determine the optimum applied potential for the electrochemical reduction. An applied voltage of 15 V successfully formed a uniformly coated rGO thin film, which significantly promoted effective electron transfer within dye-sensitized solar cells (DSSCs. Thus, DSSC performance improved. However, rGO thin films formed in voltages below or exceeding 15 V resulted in poor DSSC performance. This behavior was due to poor electron transfer within the rGO thin films caused by poor uniformity. These results revealed that DSSC constructed using 15 V rGO thin film exhibited high efficiency (η = 1.5211% attributed to its higher surface uniformity than other samples. The addition of natural lemon juice (pH ~ 2.3 to the electrolyte accelerated the deposition and strengthened the adhesion of rGO thin film onto fluorine-doped tin oxide (FTO glasses.

  6. Understanding the microstructures of triangular defects in 4H-SiC homoepitaxial

    Science.gov (United States)

    Guo, Jianqiu; Yang, Yu; Raghothamachar, Balaji; Kim, Taejin; Dudley, Michael; Kim, Jungyu

    2017-12-01

    Triangular defects are frequently observed in 4H-SiC homoepitaxial layers and their existence is reported to greatly degrade the performance of corresponding p-n junction diodes. Regarding the formation mechanisms of these defects, there have been a few models postulated before, which will be briefly reviewed here. In this study, we have observed a significant number of triangular defects in a 150mm n-/n+ commercial 4H-SiC homoepitaxial wafer using Nomarski Microscopy and Synchrotron X-ray topography (SXRT). The observed defects show varying morphology and complexity. In order to investigate their complex microstructures and gain insight on the formation mechanism, selected triangular defects were characterized by high resolution transmission electron microscopy (HRTEM) and micro-Raman spectroscopy. Results confirm that all the triangular defects have a 3C-SiC nature. In addition, { 1 1 1 } twins and double positioning boundaries (DPBs) were frequently observed inside the triangular defects. Based on these observations, a model has been developed to interpret the formation mechanism of these defects. In this model, the introduction of downfall particle during epitaxy creates a large triangular on-axis terrace, on which 3C-SiC crystals nucleate 2-dimensionally and grow under no constraint, eventually overgrown by 4H-SiC growth steps.

  7. Structural and optical properties of manganese oxide thin films deposited by pulsed laser deposition at different substrate temperatures

    Science.gov (United States)

    Jamil, H.; Khaleeq-ur-Rahman, M.; Dildar, I. M.; Shaukat, Saima

    2017-09-01

    We report the use of pulsed laser deposition (PLD) to grow manganese oxide thin films at a fixed low oxygen pressure at different temperatures on silicon (1 0 0) substrates. Structural properties of the thin films were examined using x-ray diffraction and Fourier transform infrared spectroscopy. Surface morphology and topography of the films was determined using atomic force microscopy and optical microscopy, while optical properties of the thin films were studied using spectroscopic ellipsometry. It was found that PLD is a convenient technique to deposit different phases of manganese oxide by tuning the deposition temperature. All measured physical properties such as morphology, topography, crystallite size, and optical band gap were clearly dependent on the substrate temperature chosen.

  8. Structural and X-Ray Photoelectron Spectroscopy Study of Al-Doped Zinc-Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    Bong Ju Lee

    2015-01-01

    Full Text Available Al-doped zinc-oxide (AZO thin films were prepared by RF magnetron sputtering at different oxygen partial pressures and substrate temperatures. The charge-carrier concentrations in the films decreased from 1.69 × 1021 to 6.16 × 1017 cm−3 with increased gas flow rate from 7 to 21 sccm. The X-ray diffraction (XRD patterns show that the (002/(103 peak-intensity ratio decreased as the gas flow rate increased, which was related to the increase of AZO thin film disorder. X-ray photoelectron spectra (XPS of the O1s were decomposed into metal oxide component (peak A and the adsorbed molecular oxygen on thin films (peak B. The area ratio of XPS peaks (A/B was clearly related to the stoichiometry of AZO films; that is, the higher value of A/B showed the higher stoichiometric properties.

  9. Transport physics and device modeling of zinc oxide thin-film transistors. Pt. II: Contact Resistance in Short Channel Devices

    NARCIS (Netherlands)

    Torricelli, F.; Meijboom, J.R.; Smits, E.; Tripathi, A.K.; Gelinck, G.H.; Colalongo, L.; Kovacs-Vajna, Z.M.; Leeuw, D. de; Cantatore, E.

    2011-01-01

    Abstract—Short-channel zinc oxide (ZnO) thin-film transistors (TFTs) are investigated in a wide range of temperatures and bias conditions. Scaling down the channel length, the TFT performance is seriously affected by contact resistances, which depend on gate voltage and temperature. To account for

  10. Transport physics and device modeling of zinc oxide thin-film transistors. Pt. I: Long-channel devices

    NARCIS (Netherlands)

    Torricelli, F.; Meijboom, J.R.; Smits, E.; Tripathi, A.K.; Ferroni, M.; Federici, S.; Gelinck, G.H.; Colalongo, L.; Kovacs-Vajna, Z.M.; Leeuw, D. de; Cantatore, E.

    2011-01-01

    Thin-film transistors (TFTs), which use zinc oxide (ZnO) as an active layer, were fabricated and investigated in detail. The transport properties of ZnO deposited by spray pyrolysis (SP) on a TFT structure are studied in a wide range of temperatures, electrical conditions (i.e., subthreshold,

  11. Low-temperature formation of source–drain contacts in self-aligned amorphous oxide thin-film transistors

    NARCIS (Netherlands)

    Nag, M.; Muller, R.; Steudel, S.; Smout, S.; Bhoolokam, A.; Myny, K.; Schols, S.; Genoe, J.; Cobb, B.; Kumar, A.; Gelinck, G.; Fukui, Y.; Groeseneken, G.; Heremans, P.

    2015-01-01

    We demonstrated self-aligned amorphous-Indium-Gallium-Zinc-Oxide (a-IGZO) thin-film transistors (TFTs) where the source–drain (S/D) regions were made conductive via chemical reduction of the a-IGZO via metallic calcium (Ca). Due to the higher chemical reactivity of Ca, the process can be operated at

  12. Properties of the State of the Art of Bulk III-V Nitride Substrates and Homoepitaxial Layers

    Science.gov (United States)

    2010-01-01

    power electronic devices (e.g. FETS , HEMTs). The high growth temperature usually required to produce these wide bandgap materials exacerbates fundamental...addition, doping activation and self-compensation are difficult to control at the typically high deposition temperatures. Furthermore, the high...performance. Overcoming these limitations will require the use of native substrates to grow electronic grade homoepitaxial layers. The commonly used

  13. Lateral Movement of Screw Dislocations During Homoepitaxial Growth and Devices Yielded Therefrom Free of the Detrimental Effects of Screw Dislocations

    Science.gov (United States)

    Neudeck, Philip G. (Inventor); Powell, J. Anthony (Inventor)

    2004-01-01

    The present invention is related to a method that enables and improves wide bandgap homoepitaxial layers to be grown on axis single crystal substrates, particularly SiC. The lateral positions of the screw dislocations in epitaxial layers are predetermined instead of random, which allows devices to be reproducibly patterned to avoid performance degrading crystal defects normally created by screw dislocations.

  14. In-Situ Preparation of Ytterbium-Barium - Superconducting Thin Films Using Pure Ozone Vapor Oxidation

    Science.gov (United States)

    Berkley, Dale Dane

    A new process for preparing thin films of the YBa_2Cu_3O _{rm 7-x} high transition temperature superconducting oxide completely in-situ, without the need for a post-evaporation anneal has been developed. This work is a significant advancement in the effort to achieve a fully mature, high quality thin film-making process for scientific and technical applications. A pure ozone vapor, derived from the distilled liquid, is used to oxidize the co-evaporated metallic constituents during deposition to nucleate the superconducting phase in the vacuum chamber. Films exhibiting zero resistance transition temperatures at 85 K have been grown on strontium titanate substrates using a substrate temperature of 700 ^circC. Background evaporation pressures of 2 x 10^{-7}Torr are employed during film growth. Films prepared using this process contain primarily mixed a- and c-axis oriented grains which, as evidenced by Transmission Electron Microscopy, exhibit a high degree of epitaxial order with the substrate. Processing at lower substrate temperatures results in a depression of T _{rm c} consistent with the behavior observed for other in-situ techniques. It is unclear at this time whether this depression can be attributed to an oxygen deficiency or an expanded c-axis lattice parameter which is always associated with lower temperature processing. Measurements of the critical current of a prototype YBa_2Cu_3O _{rm 7-x}/Au/Pb proximity tunneling junction prepared in-situ using the ozone process do not exhibit the expected magnetic field and temperature dependence. This observation may be the result of a poorly defined tunneling geometry subject to the vagaries of edge effects or filamentary electrical shorts through the normal metal layer. Important implications for the investigation of an isotope effect in the high T_{rm c} superconductors is made possible by the development of the ozone technique. By distilling the ^{18}O gas into a "heavy ozone," thin films can be efficiently

  15. Poole-Frenkel-effect as dominating current mechanism in thin oxide films—An illusion?!

    Science.gov (United States)

    Schroeder, Herbert

    2015-06-01

    In many of the publications, over 50 per year for the last five years, the Poole-Frenkel-effect (PFE) is identified or suggested as dominating current mechanism to explain measured current-electric field dependencies in metal-insulator-metal (MIM) thin film stacks. Very often, the insulating thin film is a metal oxide as this class of materials has many important applications, especially in information technology. In the overwhelming majority of the papers, the identification of the PFE as dominating current mechanism is made by the slope of the current-electric field curve in the so-called Poole-Frenkel plot, i.e., logarithm of current density, j, divided by the applied electric field, F, versus the square root of that field. This plot is suggested by the simplest current equation for the PFE, which comprises this proportionality (ln(j/F) vs. F1/2) leading to a straight line in this plot. Only one other parameter (except natural constants) may influence this slope: the optical dielectric constant of the insulating film. In order to identify the importance of the PFE simulation studies of the current through MIM stacks with thin insulating films were performed and the current-electric field curves without and with implementation of the PFE were compared. For the simulation, an advanced current model has been used combining electronic carrier injection/ejection currents at the interfaces, described by thermionic emission, with the carrier transport in the dielectric, described by drift and diffusion of electrons and holes in a wide band gap semiconductor. Besides the applied electric field (or voltage), many other important parameters have been varied: the density of the traps (with donor- and acceptor-like behavior); the zero-field energy level of the traps within the energy gap, this energy level is changed by the PFE (also called internal Schottky effect); the thickness of the dielectric film; the permittivity of the dielectric film simulating different oxide

  16. Poole-Frenkel-effect as dominating current mechanism in thin oxide films—An illusion?!

    Energy Technology Data Exchange (ETDEWEB)

    Schroeder, Herbert [Electronic Materials, PGI-7, Research Center Jülich, 52425 Jülich (Germany)

    2015-06-07

    In many of the publications, over 50 per year for the last five years, the Poole-Frenkel-effect (PFE) is identified or suggested as dominating current mechanism to explain measured current–electric field dependencies in metal-insulator-metal (MIM) thin film stacks. Very often, the insulating thin film is a metal oxide as this class of materials has many important applications, especially in information technology. In the overwhelming majority of the papers, the identification of the PFE as dominating current mechanism is made by the slope of the current–electric field curve in the so-called Poole-Frenkel plot, i.e., logarithm of current density, j, divided by the applied electric field, F, versus the square root of that field. This plot is suggested by the simplest current equation for the PFE, which comprises this proportionality (ln(j/F) vs. F{sup 1/2}) leading to a straight line in this plot. Only one other parameter (except natural constants) may influence this slope: the optical dielectric constant of the insulating film. In order to identify the importance of the PFE simulation studies of the current through MIM stacks with thin insulating films were performed and the current–electric field curves without and with implementation of the PFE were compared. For the simulation, an advanced current model has been used combining electronic carrier injection/ejection currents at the interfaces, described by thermionic emission, with the carrier transport in the dielectric, described by drift and diffusion of electrons and holes in a wide band gap semiconductor. Besides the applied electric field (or voltage), many other important parameters have been varied: the density of the traps (with donor- and acceptor-like behavior); the zero-field energy level of the traps within the energy gap, this energy level is changed by the PFE (also called internal Schottky effect); the thickness of the dielectric film; the permittivity of the dielectric film simulating

  17. Metal Oxide Thin Film Growth by Laser Ablation and Its Applications in High Surface Area Photoanodes

    Science.gov (United States)

    Ghosh, Rudresh

    Thin films are widely used in various applications, including but not limited to simple reflective coatings for mirrors, electrodes for lithium batteries, conducting substrates for electronic circuits, gas sensors and solar cells. As the scope of their applications has widened over the years so has the need to obtain different structural motifs for thin films. A large variety of fabrication techniques are commonly employed to obtain these structures. Pulsed laser deposition (PLD) can be used to obtain films varying from extremely compact and only a few angstroms thick to micron thick porous structures. In this dissertation I introduce a model for predicting different structures as a function of laser parameters and deposition environments in a pulsed laser deposition system. This is followed by a comparison of simulated and experimentally obtained structures. I then use this model to obtain tailored structures suited for individual applications. One of the unique structures obtained using the PLD consists of vertically-aligned structures with nanoparticles as their building blocks. I investigate the superiority of this unique structure over random nanoparticle networks as photoanodes for titanium dioxide (TiO 2)-based dye-sensitized solar cells (DSSC). UV-Vis studies show that there is a 1.4 x enhancement of surface area for PLD-TiO2 photoanodes compared to the best sol-gel films. PLD-TiO2 incident photon to current efficiency (IPCE) values are comparable to 3 x thicker sol-gel films and nearly 92% absorbed photon to current efficiency (APCE) values have been observed for optimized structures. I also examine the suitability of PLD-synthesized niobium oxide (Nb2O5) and tantalum-doped titanium oxide (Ta: TiO2) as photoanode materials. For optimized PLD-Nb2 O5 based DSSCs IPCE values up to 40%, APCE values around 90% and power conversion efficiency of 2.41% were obtained. DSSCs made of PLD-Ta:TiO2 show enhanced photocurrents as well photo efficiency over those based

  18. Metal-insulator transition in tin doped indium oxide (ITO) thin films: Quantum correction to the electrical conductivity

    Science.gov (United States)

    Kaushik, Deepak Kumar; Kumar, K. Uday; Subrahmanyam, A.

    2017-01-01

    Tin doped indium oxide (ITO) thin films are being used extensively as transparent conductors in several applications. In the present communication, we report the electrical transport in DC magnetron sputtered ITO thin films (prepared at 300 K and subsequently annealed at 673 K in vacuum for 60 minutes) in low temperatures (25-300 K). The low temperature Hall effect and resistivity measurements reveal that the ITO thin films are moderately dis-ordered (kFl˜1; kF is the Fermi wave vector and l is the electron mean free path) and degenerate semiconductors. The transport of charge carriers (electrons) in these disordered ITO thin films takes place via the de-localized states. The disorder effects lead to the well-known `metal-insulator transition' (MIT) which is observed at 110 K in these ITO thin films. The MIT in ITO thin films is explained by the quantum correction to the conductivity (QCC); this approach is based on the inclusion of quantum-mechanical interference effects in Boltzmann's expression of the conductivity of the disordered systems. The insulating behaviour observed in ITO thin films below the MIT temperature is attributed to the combined effect of the weak localization and the electron-electron interactions.

  19. Metal-insulator transition in tin doped indium oxide (ITO thin films: Quantum correction to the electrical conductivity

    Directory of Open Access Journals (Sweden)

    Deepak Kumar Kaushik

    2017-01-01

    Full Text Available Tin doped indium oxide (ITO thin films are being used extensively as transparent conductors in several applications. In the present communication, we report the electrical transport in DC magnetron sputtered ITO thin films (prepared at 300 K and subsequently annealed at 673 K in vacuum for 60 minutes in low temperatures (25-300 K. The low temperature Hall effect and resistivity measurements reveal that the ITO thin films are moderately dis-ordered (kFl∼1; kF is the Fermi wave vector and l is the electron mean free path and degenerate semiconductors. The transport of charge carriers (electrons in these disordered ITO thin films takes place via the de-localized states. The disorder effects lead to the well-known ‘metal-insulator transition’ (MIT which is observed at 110 K in these ITO thin films. The MIT in ITO thin films is explained by the quantum correction to the conductivity (QCC; this approach is based on the inclusion of quantum-mechanical interference effects in Boltzmann’s expression of the conductivity of the disordered systems. The insulating behaviour observed in ITO thin films below the MIT temperature is attributed to the combined effect of the weak localization and the electron-electron interactions.

  20. TAPE CALENDERING MANUFACTURING PROCESS FOR MULTILAYER THIN-FILM SOLID OXIDE FUEL CELLS

    Energy Technology Data Exchange (ETDEWEB)

    Nguyen Minh; Kurt Montgomery

    2004-10-01

    This report summarizes the work performed by Hybrid Power Generation Systems, LLC during the Phases I and II under Contract DE-AC26-00NT40705 for the U. S. Department of Energy, National Energy Technology Laboratory (DOE/NETL) entitled ''Tape Calendering Manufacturing Process For Multilayer Thin-Film Solid Oxide Fuel Cells''. The main objective of this project was to develop the manufacturing process based on tape calendering for multilayer solid oxide fuel cells (SOFC's) using the unitized cell design concept and to demonstrate cell performance under specified operating conditions. Summarized in this report is the development and improvements to multilayer SOFC cells and the unitized cell design. Improvements to the multilayer SOFC cell were made in electrochemical performance, in both the anode and cathode, with cells demonstrating power densities of nearly 0.9 W/cm{sup 2} for 650 C operation and other cell configurations showing greater than 1.0 W/cm{sup 2} at 75% fuel utilization and 800 C. The unitized cell design was matured through design, analysis and development testing to a point that cell operation at greater than 70% fuel utilization was demonstrated at 800 C. The manufacturing process for both the multilayer cell and unitized cell design were assessed and refined, process maps were developed, forming approaches explored, and nondestructive evaluation (NDE) techniques examined.

  1. Titanium oxide nanocoating on a titanium thin film deposited on a glass substrate

    Energy Technology Data Exchange (ETDEWEB)

    Kotsedi, L., E-mail: kotsedi@tlabs.ac.za [UNESCO-UNISA Africa Chair in Nanosciences-Nanotechnology, College of Graduate Studies, University of South Africa, Muckleneuk Ridge, PO Box 392, Pretoria (South Africa); Nanosciences African Network (NANOAFNET), iThemba LABS, National Research Foundation, 1 Old Faure Road, Somerset West 7129, PO Box 722, Somerset West, Western Cape (South Africa); Nuru, Z.Y. [UNESCO-UNISA Africa Chair in Nanosciences-Nanotechnology, College of Graduate Studies, University of South Africa, Muckleneuk Ridge, PO Box 392, Pretoria (South Africa); Nanosciences African Network (NANOAFNET), iThemba LABS, National Research Foundation, 1 Old Faure Road, Somerset West 7129, PO Box 722, Somerset West, Western Cape (South Africa); Eaton, S.M. [Physics Department, Politecnico di Milano, Piazza Leonardo Da Vinci, 32, 20133 Milano (Italy); Cummings, F.R. [University of the Western Cape, Electron Microscopy Unit, Physics Department, Bellville 7535, Cape Town (South Africa); Turco, S. Lo; Ntwaeaborwa, O.M. [Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Milano, Italy Via Giovanni Pascoli, 70/3, 20133 Milano (Italy); Ramponi, R. [Institute for Photonics and Nanotechnologies (IFN)-CNR, Piazza Leonardo Da Vinci, 32, 20133 Milano (Italy); Maaza, M. [UNESCO-UNISA Africa Chair in Nanosciences-Nanotechnology, College of Graduate Studies, University of South Africa, Muckleneuk Ridge, PO Box 392, Pretoria (South Africa); Nanosciences African Network (NANOAFNET), iThemba LABS, National Research Foundation, 1 Old Faure Road, Somerset West 7129, PO Box 722, Somerset West, Western Cape (South Africa)

    2016-03-31

    Thin films of titanium were deposited on a glass substrate using electron beam evaporator. Femtosecond laser pulses were focused on the surface of the films, and the samples were scanned while mounted on the motorized computer-controlled motion stage to produce an areal modification of the films. X-ray diffraction of the laser-patterned samples showed evidence of the formation of a γ-Ti{sub 3}O{sub 5} with a monoclinic phase. Rutherford backscattering spectrometry simulation showed that there is an increase in the oxygen concentration as the average laser fluence is increased. Time of flight secondary ions mass spectrometry analysis showed an even distribution of the titanium and oxygen ions on the sample and also ionized molecules of the oxides of titanium were observed. The formation of the oxide of titanium was further supported using the UV–Vis-NIR spectroscopy, which showed that for 0.1 J/cm{sup 2} fluence, the laser-exposed film showed the electron transfer band and the d–d transition peak of titanium was observed at lower wavelengths. - Highlights: • γ-Ti{sub 3}O{sub 5} formed using femtosecond laser. • Fluence and oxygen relation were studied. • Nanoflakes of γ-Ti{sub 3}O{sub 5} were observed under HRSEM.

  2. Temporal and voltage stress stability of high performance indium-zinc-oxide thin film transistors

    Science.gov (United States)

    Song, Yang; Katsman, Alexander; Butcher, Amy L.; Paine, David C.; Zaslavsky, Alexander

    2017-10-01

    Thin film transistors (TFTs) based on transparent oxide semiconductors, such as indium zinc oxide (IZO), are of interest due to their improved characteristics compared to traditional a-Si TFTs. Previously, we reported on top-gated IZO TFTs with an in-situ formed HfO2 gate insulator and IZO active channel, showing high performance: on/off ratio of ∼107, threshold voltage VT near zero, extracted low-field mobility μ0 = 95 cm2/V·s, and near-perfect subthreshold slope at 62 mV/decade. Since device stability is essential for technological applications, in this paper we report on the temporal and voltage stress stability of IZO TFTs. Our devices exhibit a small negative VT shift as they age, consistent with an increasing carrier density resulting from an increasing oxygen vacancy concentration in the channel. Under gate bias stress, freshly annealed TFTs show a negative VT shift during negative VG gate bias stress, while aged (>1 week) TFTs show a positive VT shift during negative VG stress. This indicates two competing mechanisms, which we identify as the field-enhanced generation of oxygen vacancies and the field-assisted migration of oxygen vacancies, respectively. A simplified kinetic model of the vacancy concentration evolution in the IZO channel under electrical stress is provided.

  3. Manipulating the Architecture of Atomically Thin Transition Metal (Hydr)oxides for Enhanced Oxygen Evolution Catalysis.

    Science.gov (United States)

    Dou, Yuhai; Zhang, Lei; Xu, Jiantie; He, Chun-Ting; Xu, Xun; Sun, Ziqi; Liao, Ting; Nagy, Balázs; Liu, Porun; Dou, Shi Xue

    2018-02-27

    Graphene-like nanomaterials have received tremendous research interest due to their atomic thickness and fascinating properties. Previous studies mainly focus on the modulation of their electronic structures, which undoubtedly optimizes the electronic properties, but is not the only determinant of performance in practical applications. Herein, we propose a generalized strategy to incrementally manipulate the architectures of several atomically thin transition metal (hydr)oxides, and study their effects on catalytic water oxidation. The results demonstrate the obvious superiority of a wrinkled nanosheet architecture in both catalytic activity and durability. For instance, wrinkled Ni(OH) 2 nanosheets display a low overpotential of 358.2 mV at 10 mA cm -2 , a high current density of 187.2 mA cm -2 at 500 mV, a small Tafel slope of 54.4 mV dec -1 , and excellent long-term durability with gradually optimized performance, significantly outperforming other nanosheet architectures and previously reported catalysts. The outstanding catalytic performance is mainly attributable to the 3D porous network structure constructed by wrinkled nanosheets, which not only provides sufficient contact between electrode materials and current collector, but also offers highly accessible channels for facile electrolyte diffusion and efficient O 2 escape. Our study provides a perspective on improving the performance of graphene-like nanomaterials in a wide range of practical applications.

  4. Reduced graphene oxide/molecular imprinted polymer-organic thin film transistor for amino acid detection

    Science.gov (United States)

    Halim, Nurul Farhanah AB.; Musa, Nur Hazwani; Zakaria, Zulkhairi; Von Schleusingen, Mubaraq; Ahmad, Mohd Noor; Derman, Nazree; Shakaff, Ali Yeon Md.

    2017-03-01

    This works reports the electrical performance of reduced graphene oxide (RGO)/Molecular imprinted polymer (MIP)- organic thin film transistor (OTFT) for amino-acid detection, serine. These biomimetic sensors consider MIP as man-tailored biomimetic recognition sites that play an important role in signal transduction. MIP provides recognition sites compatible with serine molecules was developed by dispersing serine with methylacrylate acid (MAA) as functional monomer and Ethylene glycol dimethylacrylate (EGDMA) as cross-linker. The imprinted polymeric were mixed with reduced graphene oxide to produced sensing layer for the sensor. RGO-MIP layer was introduced between source and drain of OTFT via spin coating as a detecting layer for serine molecules. RGO was introduced into MIP, to allow a highly conductive sensing material thus enhanced selectivity and sensitivity of the sensor. By analyzing the electrical performance of the sensors, the performances of OTFT sensor enhanced with RGO/MIP interlayer and OTFT sensor with MIP interlayer when exposed to serine analyte were obtained. The results showed that there were remarkable shifts of drain current (ID) obtained from OTFT sensor with RGO/MIP interlayer after exposed to serine analyte. Moreover, the sensitivity of OTFT sensor with RGO/MIP interlayer was nearly higher than the OTFT sensor with MIP interlayer. Hence, it proved that RGO successfully enhanced the sensing performance of OTFT sensor.

  5. MOCVD-growth of thin zinc oxide films from zinc acetylacetonate and air

    Science.gov (United States)

    Pflitsch, Christian; Nebatti, Abdelkader; Brors, Georg; Atakan, Burak

    2012-06-01

    The metalorganic chemical vapour deposition (MOCVD) of thin zinc oxide films on borosilicate glass and silicon substrates in a hot-wall CVD-reactor (HWR) was studied. Zinc acetylacetonate (Zn(acac)2) and air were used as precursors. The aim of this work was to optimize the deposition parameters, such as pressure and deposition temperature, with respect to the film quality, structure, and homogeneity. Most experiments were performed at atmospheric pressure; this approach avoids the usage of an expensive vacuum system. It turned out that polycrystalline zinc oxide is grown at deposition temperatures above 613 K. Above 823 K, they additionally are c-axis orientated. At atmospheric pressure and lower temperature (film deposition is homogeneously over the whole tube furnace while at higher temperature inhomogeneous film growth and particle formation are observed, indicating a shift of the growth mechanism to the diffusion controlled regime. Although the homogeneity is improved by using higher flow velocities at atmospheric pressure, particle growth cannot be suppressed. Only at reduced pressure, which was 200 mbar in the present case, the deposition at 823 K is kinetically controlled and without particle formation, resulting in the homogeneous growth of well adhering ZnO films with c-axis orientation.

  6. Laser direct patterning of indium tin oxide for defining a channel of thin film transistor.

    Science.gov (United States)

    Wang, Jian-Xun; Kwon, Sang Jik; Han, Jae-Hee; Cho, Eou Sik

    2013-11-01

    In this work, using a Q-switched diode-pumped neodymium-doped yttrium vanadate (Nd:YVO4, lambda = 1064 nm) laser, a direct patterning of indium tin oxide (ITO) channel was realized on glass substrates and the results were compared and analyzed in terms of the effect of repetition rate, scanning speed on etching characteristics. The results showed that the laser conditions of 40 kHz repetition rate with a scanning speed of 500 mm/s were appropriate for the channeling of ITO electrodes. The length of laser-patterned channel was maintained at about 55 microm. However, residual spikes (about 50 nm in height) of ITO were found to be formed at the edges of the laser ablated area and a few ITO residues remained on the glass substrate after laser scanning. By dipping the laser-ablated ITO film in ITO diluted etchant (ITO etchant/DI water: 1/10) at 50 degrees C for 3 min, the spikes and residual ITO were effectively removed. At last, using the laser direct patterning, a bottom-source-drain indium gallium zinc oxide thin film transistor (IGZO-TFT) was fabricated. It is successfully demonstrated that the laser direct patterning can be utilized instead of photolithography to simplify the fabrication process of TFT channel, resulting in the increase of productivity and reduction of cost.

  7. Effective contact resistance of zinc-tin oxide-based thin film transistors.

    Science.gov (United States)

    Kang, Youjin; Han, Dongsuk; Park, Jaehyung; Shin, Sora; Choi, Duckkyun; Park, Jongwan

    2014-11-01

    We investigated different source/drain (S/D) electrode materials in thin-film transistors (TFTs) based on amorphous zinc-tin oxide (ZTO) semiconductors. The transfer length, channel conductance, and effective contact resistance between the S/D electrodes and the a-ZTO channel layer were examined. Total ON resistance (R(T)), transfer length (L(T)) and effective contact resistance (R(c-eff)) were extracted by the well-known transmission-line method (TLM) using a series of TFTs with different channel lengths. When the width of ZTO channel layer was fixed as 50 μm, the lengths were varying from 10 to 50 μm. The channel layer and S/D electrode were defined by lift-off process and for the S/D electrodes, indium-tin oxide (ITO), Cu, and Mo were used. The resistivity and work function values of electrode materials were considered when selected as candidates for S/D electrodes of ZTO-TFTs. The results showed that the ZTO-TFTs with Mo S/D electrodes had the lowest effective contact resistance indicating that ZTO-TFTs with Mo electrodes have better electrical performance compared to others.

  8. Optical characterization and electrochemical behavior of electrochromic windows using magnetron sputter deposition Tungsten Oxide and (1-x) WO 3xTiO II thin films

    Science.gov (United States)

    Li, Zhuying; Liu, Zuli; Yao, Kailun; Song, Yusu

    2006-02-01

    Since Deb's experiment in 1973 on the electrochromic effect, transmissive electrochromic devices (ECDs) exhibit outstanding potential as energy efficient window controls which allow dynamic control of the solar energy transmission [1]. These devices with non-volatile memory, once in the coloured state, remain in the same state even after removal of the field. The optical and electrochemical properties of electrochromic windows using magnetron sputter deposition tungsten oxide thin films and titanium oxide doped tungsten oxide thin films are investigated. From the UV region of the transmittance spectra, the band gap energy from the fundamental absorption edge can be determined. And the impedance of these thin films in 1 mol LiClO 4 propylene carbonate electrolyte (LIPC) are measured and analysed. Equivalent circuit of thin film impedances, and correlative resistances and constant phase angle element are gained. SEM and XRD of the tungsten oxide thin films and (1-x) WO 3xTiO II thin films are studied. These performance characteristics make tungsten oxide thin films and titanium oxide doped tungsten oxide thin films materials suitable for electrochromic windows applications.

  9. Novel nanostructure zinc zirconate, zinc oxide or zirconium oxide pastes coated on fluorine doped tin oxide thin film as photoelectrochemical working electrodes for dye-sensitized solar cell.

    Science.gov (United States)

    Hossein Habibi, Mohammad; Askari, Elham; Habibi, Mehdi; Zendehdel, Mahmoud

    2013-03-01

    Zinc zirconate (ZnZrO(3)) (ZZ), zinc oxide (ZnO) (ZO) and zirconium oxide (ZrO(2)) (ZRO) nano-particles were synthesized by simple sol-gel method. ZZ, ZO and ZRO nano-particles were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD) and UV-Vis diffuse reflectance spectrum (DRS). Nanoporous ZZ, ZO and ZRO thin films were prepared doctor blade technique on the fluorine-doped tin oxide (FTO) and used as working electrodes in dye sensitized solar cells (DSSC). Their photovoltaic behavior were compared with standard using D35 dye and an electrolyte containing [Co(bpy)(3)](PF(6))(2), [Co(pby)(3)](PF(6))(3), LiClO(4), and 4-tert-butylpyridine (TBP). The properties of DSSC have been studied by measuring their short-circuit photocurrent density (Jsc), open-circuit voltage (VOC) and fill factor (ff). The application of ZnZrO(3) as working electrode produces a significant improvement in the fill factor (ff) of the dye-sensitized solar cells (ff=56%) compared to ZnO working electrode (ff=40%) under the same condition. Copyright © 2012 Elsevier B.V. All rights reserved.

  10. Synthesis and characterization of transparent conducting indium iron oxide bulk and thin film materials

    Science.gov (United States)

    Fahed, Charbel T.

    2009-12-01

    In this dissertation, solid solutions of indium-iron oxide (In2-xFexO3) with varying compositions were prepared and a new ultra-fast microwave method was used for deposition of thin films of this material. Non-destructive characterization methods were used for studying these transparent conducting oxide (TCO) materials. In this work, the linear thermal expansion coefficients of bulk In 2-xFexO3 have been determined using high resolution x-ray diffraction measurements. The addition of Fe2O3 to In2O3 resulted in the formation of solid solutions in body centered cubic phase. The thermal expansion coefficients for solid solutions of In2-xFexO3 showed increased values in comparison to that of pure In2O3 phase. The study of thermal properties of these TCO materials is crucial for their potential applications in photovoltaic and spintronic devices operating at various temperatures. In addition, the bulk samples of In2-xFexO 3 were studied for their structural, transport, and magnetic properties, as a function of composition. The lattice parameters of the solid solutions decrease with increasing Fe-content. The four-probe electrical measurements showed reduced conductivities for higher Fe compositions. The magnetic data displayed ferromagnetism in these solid solutions, and that can be attributed to the presence of trace amounts of Fe2O3 or Fe 3O4. These results might be important for the use of TCOs in spintronic applications as well as structural materials such as ceramic coatings intended to withstand harsh environments. Thin films of Indium-iron oxide compositions were deposited by using ultra-fast microwave heating. This is a new method of deposition of TCOs that has never been done before. The advantage of microwave heating deposition over other deposition techniques is that it is extremely fast and can be used for materials of high evaporation temperature. In this work, the deposition was done in 50-120 seconds at 1950-2000°C. Characteristics of these transparent

  11. Effects of excimer laser annealing on low-temperature solution based indium-zinc-oxide thin film transistor fabrication

    OpenAIRE

    Chen,Chao-Nan; Huang, Jung-Jie

    2015-01-01

    A Solution Based Indium-Zinc-Oxide thin-film transistor (TFT) with a field-effect mobility of 0.58 cm2/Vs, a threshold voltage of 2.84 V by using pulse laser annealing processes. Indium-zinc-oxide (IZO) films with a low process temperature were deposited by sol-gel solution based method and KrF excimer laser annealing (wavelength of 248 nm). Solution based indium-zinc-oxide (IZO) films usually needs high temperature about 500 °C post annealing in a oven. KrF excimer laser annealing shows adva...

  12. A study of the initial oxidation of evaporated thin films of aluminum by AES, ELS, and ESD

    Science.gov (United States)

    Bujor, M.; Larson, L. A.; Poppa, H.

    1982-01-01

    The room temperature, low pressure, oxidation of evaporated aluminum thin films has been studied by AES, ELS, and ESD. ESD was the most sensitive of the three methods to characterize a clean aluminum surface. Two oxidation stages were distinguished in the 0-3000 L oxygen exposure range. Between 0 and 50 L, the chemisorption of oxygen atoms was characterized by a fast decrease of the 67 eV AES Al peak and the 10 eV surface plasmon peak, and by a simultaneous increase of the oxygen AES and ESD signals. After 50 L, a change in slope in all AES and ESD signal variations was attributed to the slow growth of a thin layer of aluminum oxide, which after 3000 L was still only a few angstroms thick.

  13. Size-controlled nickel oxide nanoparticle synthesis using mesoporous silicon thin films

    Energy Technology Data Exchange (ETDEWEB)

    Fain, Joshua S., E-mail: joshua.s.fain@vanderbilt.edu; Mares, Jeremy W.; Weiss, Sharon M. [Vanderbilt University, Department of Electrical Engineering and Computer Science (United States)

    2015-08-15

    A process for chemically synthesizing size-controllable nickel oxide (NiO) nanoparticles (NPs) within the interior of mesoporous silicon (PSi) thin films is presented. The method is demonstrated to provide control of the average NP size over an order of magnitude, from 9 nm to 128 nm diameter, by fabricating PSi films with mean pore diameters ranging from 32 to 140 nm and annealing at temperatures between 300 and 1100 °C. NiO NPs are readily detached from the PSi films through electrolytic dissolution of the PSi host matrix. Nanocomposite films and NPs are characterized through x-ray diffraction, scanning electron microscopy, transmission electron microscopy, and energy-dispersive x-ray spectroscopy. Optical absorbance measurements of free NiO NPs in aqueous suspension indicate that the optical bandgap is tuned from 3.65 to 3.9 eV, as expected from the effects of quantum confinement. This synthesis process is amenable to the batch fabrication of a wide variety of metal oxide NPs at temperatures up to 1000 °C with sizes below 100 nm. The method is advantageous over conventional chemical synthesis techniques as it facilitates control of the resulting NP size across a wide range and also permits high-temperature annealing while precluding extended crystallite formation. Furthermore, the use of a PSi template enables direct integration of nanoparticulate metal oxide into Si-based, on-chip applications. NiO was selected here as the model system to demonstrate this technique due to its numerous applications including energy storage and memristor technologies.

  14. Preparation of transparent and conductive multicomponent Zn-In-Sn oxide thin films by vacuum arc plasma evaporation

    Science.gov (United States)

    Minami, Tadatsugu; Tsukada, Satoshi; Minamino, Youhei; Miyata, Toshihiro

    2005-07-01

    This article describes the preparation of transparent conducting oxide (TCO) thin films by a vacuum arc plasma evaporation (VAPE) method using multicomponent oxide materials composed of any combination of two of the following binary compounds: ZnO, In2O3, and SnO2. The resulting TCO thin films were prepared with high deposition rates with the desired chemical composition in the ZnO-In2O3, In2O3-SnO2, and SnO2-ZnO systems by altering the composition of the sintered oxide fragments used as the source materials. Minimum resistivities were obtained in amorphous In2O3-ZnO, SnO2-In2O3, and ZnO-SnO2 thin films that were prepared with a Zn content of about 8.5 at. %, an In content of about 46 at. %, and a Sn content of about 78 at. %, respectively. It was found that the electrical, optical and chemical properties in ZnO-SnO2 thin films prepared using the VAPE method could be controlled by altering the Sn content.

  15. Facile Routes To Improve Performance of Solution-Processed Amorphous Metal Oxide Thin Film Transistors by Water Vapor Annealing.

    Science.gov (United States)

    Park, Won-Tae; Son, Inyoung; Park, Hyun-Woo; Chung, Kwun-Bum; Xu, Yong; Lee, Taegweon; Noh, Yong-Young

    2015-06-24

    Here, we report on a simple and high-rate oxidization method for producing solution-based compound mixtures of indium zinc oxide (IZO) and indium gallium zinc oxide (IGZO) metal-oxide semiconductors (MOS) for thin-film transistor (TFT) applications. One of the issues for solution-based MOS fabrication is how to sufficiently oxidize the precursor in order to achieve high performance. As the oxidation rate of solution processing is lower than vacuum-based deposition such as sputtering, devices using solution-processed MOS exhibit relatively poorer performance. Therefore, we propose a method to prepare the metal-oxide precursor upon exposure to saturated water vapor in a closed volume for increasing the oxidization efficiency without requiring additional oxidizing agent. We found that the hydroxide rate of the MOS film exposed to water vapor is lower than when unexposed (≤18%). Hence, we successfully fabricated oxide TFTs with high electron mobility (27.9 cm(2)/V·s) and established a rapid process (annealing at 400 °C for 5 min) that is much shorter than the conventional as-deposited long-duration annealing (at 400 °C for 1 h) whose corresponding mobility is even lower (19.2 cm(2)/V·s).

  16. Cadmium-manganese oxide composite thin films: Synthesis, characterization and photoelectrochemical properties

    Energy Technology Data Exchange (ETDEWEB)

    Mansoor, M.A. [Department of Chemistry, Faculty of Science, University of Malaya, Kuala Lumpur 50603 (Malaysia); Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, Faculty of Science, Kuala Lumpur 50603 (Malaysia); Ebadi, M. [Solar Energy Research Institute, University Kebangsaan Malaysia, Bangi 43600, Selangor (Malaysia); Mazhar, M., E-mail: mazhar42pk@yahoo.com [Department of Chemistry, Faculty of Science, University of Malaya, Kuala Lumpur 50603 (Malaysia); Huang, N.M. [Low Dimensional Materials Research Centre, Department of Physics, University of Malaya, Faculty of Science, Kuala Lumpur 50603 (Malaysia); Mun, L.K.; Misran, M. [Department of Chemistry, Faculty of Science, University of Malaya, Kuala Lumpur 50603 (Malaysia); Basirun, W.J. [Department of Chemistry, Faculty of Science, University of Malaya, Kuala Lumpur 50603 (Malaysia); Institute of Nanotechnology and Catalysis (NanoCat), University Malaya, Kuala Lumpur 50603 (Malaysia)

    2017-01-15

    Ceramic composite CdO–Mn{sub 2}O{sub 3} thin films have been deposited on fluorine doped tin oxide (FTO) coated glass substrates by aerosol assisted chemical vapour deposition (AACVD) using a 1:1 mixture of cadmium complex, [Cd(dmae){sub 2}(OAc){sub 2}]·H{sub 2}O (1) (where dmae = 2-dimethylaminoethanolato and OAc = acetato), and diacetatomanganese (II). The phase purity, stoichiometry and thickness of the films were examined by X-ray diffraction (XRD), Fourier transformed infra-red (FTIR), Raman spectroscopy, field emission gun scanning electron microscopy (FEG-SEM), energy dispersive X-ray spectroscopy (EDX), UV–Vis spectroscopy and profilometer. The FEG-SEM analysis illustrated that the morphology of the fabricated films was influenced by the type of solvent. The optical direct band gap of the film fabricated from THF solution was 1.95 eV. From the current–voltage characteristics it is evident that the CdO–Mn{sub 2}O{sub 3} composite semiconductor electrode exhibits n-type behaviour and the photocurrent density was found to be dependent on the deposition medium. The film deposited from THF solution displayed maximum photocurrent density of 4.80 mA cm{sup −2} at 0.65 V vs. Ag/AgCl/3 M KCl (∼1.23 V vs. RHE) in 0.5 M NaOH electrolyte. - Highlights: • Single crystal X-ray structure of [Cd(dmae){sub 2}(OAc){sub 2}]·H{sub 2}O (1). • CdO-Mn{sub 2}O{sub 3} composite photoanode thin films. • Optical band gap of CdO-Mn{sub 2}O{sub 3} photoanode. • Photoelectrochemical and EIS studies.

  17. Indium Oxide Thin Films by Atomic Layer Deposition Using Trimethylindium and Ozone

    Energy Technology Data Exchange (ETDEWEB)

    Mane, Anil U.; Allen, Amy J.; Kanjolia, Ravindra K.; Elam, Jeffrey W.

    2016-05-12

    We investigated the atomic layer deposition (ALD) of indium oxide (In2O3) thin films using alternating exposures of trimethylindium (TMIn) and a variety of oxygen sources: ozone (O-3), O-2, deionized H2O, and hydrogen peroxide (H2O2). We used in situ quartz crystal microbalance measurements to evaluate the effectiveness of the different oxygen sources and found that only O-3 yielded viable and sustained 111203 growth with TMIn. These measurements also provided details about the In2O3 growth mechanism and enabled us to verify that both the TMIn and O-3 surface reactions were self-limiting. In2O3 thin films were prepared and characterized using X-ray diffraction, ultraviolet visible spectrophotometry, spectroscopic ellipsometry, X-ray photoelectron spectroscopy, and scanning electron microscopy. The electrical transport properties of these layers were studied by Hall probe measurements. We found that, at deposition temperatures within the range of 100-200 degrees C, the In2O3 growth per cycle was nearly constant at 0.46 angstrom/cycle and the films were dense and pure. The film thickness was highly uniform (<0.3% variation) along the 45 cm length of our tubular ALD reactor. At higher growth temperatures the In2O3 growth per cycle increased due to thermal decomposition of the TMIn. The ALD In2O3 films showed resistivities as low as 3.2 x 10(-3) Omega cm, and carrier concentrations as large as 7.0 x 10(19) cm(-3). This TMIn/O-3 process for In2O3 ALD should be suitable for eventual scale-up in photovoltaics.

  18. Spectral and angular-selective thermal emission from gallium-doped zinc oxide thin film structures

    Science.gov (United States)

    Sakr, Enas; Bermel, Peter

    2017-02-01

    Simultaneously controlling both the spectral and angular emission of thermal photons can qualitatively change the nature of thermal radiation, and offers a great potential to improve a broad range of applications, including infrared light sources and thermophotovoltaic (TPV) conversion of waste heat to electricity. For TPV in particular, frequency-selective emission is necessary for spectral matching with a photovoltaic converter, while directional emission is needed to maximize the fraction of emission reaching the receiver at large separation distances. This can allow the photovoltaics to be moved outside vacuum encapsulation. In this work, we demonstrate both directionally and spectrally-selective thermal emission for p-polarization, using a combination of an epsilon-near-zero (ENZ) thin film backed by a metal reflector, a high contrast grating, and an omnidirectional mirror. Gallium-doped zinc oxide is selected as an ENZ material, with cross-over frequency in the near-infrared. The proposed structure relies on coupling guided modes (instead of plasmonic modes) to the ENZ thin film using the high contrast grating. The angular width is thus controlled by the choice of grating period. Other off-directional modes are then filtered out using the omnidirectional mirror, thus enhancing frequency selectivity. Our emitter design maintains both a high view factor and high frequency selectivity, leading to a factor of 8.85 enhancement over a typical blackbody emitter, through a combination of a 22.26% increase in view factor and a 6.88x enhancement in frequency selectivity. This calculation assumes a PV converter five widths away from the same width emitter in 2D at 1573 K.

  19. Effect of nitrogen ion implantation on the structural and optical properties of indium oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Sethi, Riti; Aziz, Anver; Siddiqui, Azher M., E-mail: amsiddiqui@jmi.ac.in [Department of Physics, Jamia Millia Islamia, New Delhi-110025 (India); Kumar, Pravin [Inter University Accelerator Center, Aruna Asaf Ali Marg, New Delhi-110067 (India); Khan, Sameen Ahmed [Department of Mathematics and Sciences, College of Arts and Applied Sciences (CAAS) Dhofar University, Salalah, Sultanate of Oman (Oman)

    2016-06-10

    : We report here synthesis and subsequent nitrogen ion implantation of indium oxide (In{sub 2}O{sub 3}) thin films. The films were implanted with 25 keV N{sup +} beam for different ion doses between 3E15 to 1E16 ions/cm{sup 2}. The resulting changes in structural and optical properties were investigated using XRD, SEM-EDAX and UV-Vis Spectrometry. XRD studies reveal decrease in crystallite size from 20.06 to 12.42 nm with increase in ion dose. SEM micrographs show an increase in the grain size from 0.8 to 1.35 µm with increase in ion dose because of the agglomeration of the grains. Also, from EDAX data on pristine and N-implanted thin films the presence of indium and oxygen without any traces of impurity elements could be seen. However, at lower ion doses such as 3E15 and 5E15 ions/cm{sup 2}, no evidence of the presence of nitrogen ion was seen. However, for the ion dose of 1E16 ions/cm{sup 2}, evidence of presence of nitrogen can be seen in the EDAX data. Band gap calculations reveal a decrease in band gap from 3.54 to 3.38 eV with increasing ion dose. However, the band gap was found to again show an increase to 3.58 eV at the highest ion dose owing to quantum confinement effect.

  20. Chemical bonding and optoelectrical properties of ruthenium doped yttrium oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Yang, Lei; Han, Jiecai [Harbin Institute of Technology, Harbin 150080 (China); Zhu, Jiaqi, E-mail: zhujq@hit.edu.cn [Harbin Institute of Technology, Harbin 150080 (China); Zhu, Yuankun [Harbin Institute of Technology, Harbin 150080 (China); Schlaberg, H.Inaki [North China Electric Power University, Beijing 102206 (China)

    2013-11-15

    Graphical abstract: IR transmittance of various transparent conductive materials (RYO films grown under RT, 400 °C and 600 °C, ITO films [2], Carbon Nano tube films [11], metal/dielectric multilayers [12]). - Highlights: • Y{sub 2}O{sub 3}:Ru (RYO) films were prepared on ZnS substrates by reactive magnetron sputtering. • Ru doping significantly decreases the resistivity and extends the transparent range. • Optical and electrical properties of RYO films can be tuned by substrate temperatures. • The RYO films exhibit excellent far-IR transmittance and electrical property. - Abstract: Highly infrared transparent conductive ruthenium doped yttrium oxide (RYO) films were deposited on zinc sulfide and glass substrates by reactive magnetron sputtering. The structural, optical, and electrical properties of the films as a function of growth temperature were studied. It is shown that the sputtered RYO thin films are amorphous and smooth surface is obtained. The infrared transmittance of the films increases with increasing the growth temperature. RYO films maintain greater than ∼65% transmittance over a wide wavelength range from 2.5 μm to 12 μm and the highest transmittance value reaches 73.3% at ∼10 μm. With increasing growth temperature, the resistivity changed in a wide range and lowest resistivity of about 3.36 × 10{sup −3} Ω cm is obtained at room temperature. The RYO thin films with high conductivity and transparency in IR spectral range would be suitable for infrared optical and electromagnetic shielding devices.

  1. Influence of incoherent twin boundaries on the electrical properties of β-Ga2O3 layers homoepitaxially grown by metal-organic vapor phase epitaxy

    Science.gov (United States)

    Fiedler, A.; Schewski, R.; Baldini, M.; Galazka, Z.; Wagner, G.; Albrecht, M.; Irmscher, K.

    2017-10-01

    We present a quantitative model that addresses the influence of incoherent twin boundaries on the electrical properties in β-Ga2O3. This model can explain the mobility collapse below a threshold electron concentration of 1 × 1018 cm-3 as well as partly the low doping efficiency in β-Ga2O3 layers grown homoepitaxially by metal-organic vapor phase epitaxy on (100) substrates of only slight off-orientation. A structural analysis by transmission electron microscopy (TEM) reveals a high density of twin lamellae in these layers. In contrast to the coherent twin boundaries parallel to the (100) plane, the lateral incoherent twin boundaries exhibit one dangling bond per unit cell that acts as an acceptor-like electron trap. Since the twin lamellae are thin, we consider the incoherent twin boundaries to be line defects with a density of 1011-1012 cm-2 as determined by TEM. We estimate the influence of the incoherent twin boundaries on the electrical transport properties by adapting Read's model of charged dislocations. Our calculations quantitatively confirm that the mobility reduction and collapse as well as partly the compensation are due to the presence of twin lamellae.

  2. Impact of soft annealing on the performance of solution-processed amorphous zinc tin oxide thin-film transistors

    KAUST Repository

    Nayak, Pradipta K.

    2013-05-08

    It is demonstrated that soft annealing duration strongly affects the performance of solution-processed amorphous zinc tin oxide thin-film transistors. Prolonged soft annealing times are found to induce two important changes in the device: (i) a decrease in zinc tin oxide film thickness, and (ii) an increase in oxygen vacancy concentration. The devices prepared without soft annealing exhibited inferior transistor performances, in comparison to devices in which the active channel layer (zinc tin oxide) was subjected to soft annealing. The highest saturation field-effect mobility - 5.6 cm2 V-1 s-1 with a drain-to-source on-off current ratio (Ion/Ioff) of 2 × 108 - was achieved in the case of devices with 10-min soft-annealed zinc tin oxide thin films as the channel layer. The findings of this work identify soft annealing as a critical parameter for the processing of chemically derived thin-film transistors, and it correlates device performance to the changes in material structure induced by soft annealing. © 2013 American Chemical Society.

  3. Impact of soft annealing on the performance of solution-processed amorphous zinc tin oxide thin-film transistors.

    Science.gov (United States)

    Nayak, Pradipta K; Hedhili, Mohamed N; Cha, Dongkyu; Alshareef, H N

    2013-05-01

    It is demonstrated that soft annealing duration strongly affects the performance of solution-processed amorphous zinc tin oxide thin-film transistors. Prolonged soft annealing times are found to induce two important changes in the device: (i) a decrease in zinc tin oxide film thickness, and (ii) an increase in oxygen vacancy concentration. The devices prepared without soft annealing exhibited inferior transistor performances, in comparison to devices in which the active channel layer (zinc tin oxide) was subjected to soft annealing. The highest saturation field-effect mobility-5.6 cm(2) V(-1) s(-1) with a drain-to-source on-off current ratio (Ion/Ioff) of 2 × 10(8)-was achieved in the case of devices with 10-min soft-annealed zinc tin oxide thin films as the channel layer. The findings of this work identify soft annealing as a critical parameter for the processing of chemically derived thin-film transistors, and it correlates device performance to the changes in material structure induced by soft annealing.

  4. A novel synthesis of tin oxide thin films by the sol-gel process for optoelectronic applications

    Directory of Open Access Journals (Sweden)

    M. Marikkannan

    2015-02-01

    Full Text Available A novel and simple chemical method based on sol-gel processing was proposed to deposit metastable orthorhombic tin oxide (SnOx thin films on glass substrates at room temperature. The resultant samples are labeled according to the solvents used: ethanol (SnO-EtOH, isopropanol (SnO-IPA and methanol (SnO-MeOH. The variations in the structural, morphological and optical properties of the thin films deposited using different solvents were characterized by X-ray diffraction, atomic force microscopy, Raman spectroscopy, Fourier transform infrared (FTIR spectroscopy, UV-vis spectroscopy and photoluminescence (PL analysis. The XRD patterns confirm that all the films, irrespective of the solvents used for preparation, were polycrystalline in nature and contained a mixed phases of tin (II oxide and tin (IV oxide in a metastable orthorhombic crystal structure. FTIR spectra confirmed the presence of Sn=O and Sn-O in all of the samples. PL spectra showed a violet emission band centered at 380 nm (3.25 eV for all of the solvents. The UV-vis spectra indicated a maximum absorption band shown at 332 nm and the highest average transmittance around 97% was observed for the SnO-IPA and SnO-MeOH thin film samples. The AFM results show variations in the grain size with solvent. The structural and optical properties of the SnO thin films indicate that this method of fabricating tin oxide is promising and that future work is warranted to analyze the electrical properties of the films in order to determine the viability of these films for various transparent conducting oxide applications.

  5. Preparation of Zinc Oxide (ZnO) Thin Film as Transparent Conductive Oxide (TCO) from Zinc Complex Compound on Thin Film Solar Cells: A Study of O2 Effect on Annealing Process

    Science.gov (United States)

    Muslih, E. Y.; Kim, K. H.

    2017-07-01

    Zinc oxide (ZnO) thin film as a transparent conductive oxide (TCO) for thin film solar cell application was successfully prepared through two step preparations which consisted of deposition by spin coating at 2000 rpm for 10 second and followed by annealing at 500 °C for 2 hours under O2 and ambient atmosphere. Zinc acetate dehydrate was used as a precursor which dissolved in ethanol and acetone (1:1 mol) mixture in order to make a zinc complex compound. In this work, we reported the O2 effect, reaction mechanism, structure, morphology, optical and electrical properties. ZnO thin film in this work shows a single phase of wurtzite, with n-type semiconductor and has band gap, carrier concentration, mobility, and resistivity as 3.18 eV, 1.21 × 10-19cm3, 11 cm2/Vs, 2.35 × 10-3 Ωcm respectively which is suitable for TCO at thin film solar cell.

  6. Thick homoepitaxial (110)-oriented phosphorus-doped n-type diamond

    Energy Technology Data Exchange (ETDEWEB)

    Balasubramaniam, Y.; Pobedinskas, P., E-mail: paulius.pobedinskas@uhasselt.be; Janssens, S. D.; Nesládek, M.; Haenen, K., E-mail: ken.haenen@uhasselt.be [Institute for Materials Research (IMO), Hasselt University, Wetenschapspark 1, B-3590 Diepenbeek (Belgium); IMOMEC, IMEC vzw, Wetenschapspark 1, B-3590 Diepenbeek (Belgium); Sakr, G.; Jomard, F.; Barjon, J. [Groupe d' Etude de la Matière Condensée (GEMaC), Université de Versailles St. Quentin en Yvelines, CNRS, Université Paris Saclay, 45 ave. des Etats-Unis, F-78035 Versailles (France); Turner, S.; Lu, Y.-G.; Verbeeck, J. [EMAT, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp (Belgium); Dexters, W. [Institute for Materials Research (IMO), Hasselt University, Wetenschapspark 1, B-3590 Diepenbeek (Belgium); Soltani, A. [Institut d' Electronique, Microélectronique et Nanotechnologie (IEMN/CNRS 8520), Université Lille, Ave. Poincaré-BP 60069, F-59652 Villeneuve d' Ascq (France)

    2016-08-08

    The fabrication of n-type diamond is essential for the realization of electronic components for extreme environments. We report on the growth of a 66 μm thick homoepitaxial phosphorus-doped diamond on a (110)-oriented diamond substrate, grown at a very high deposition rate of 33 μm h{sup −1}. A pristine diamond lattice is observed by high resolution transmission electron microscopy, which indicates the growth of high quality diamond. About 2.9 × 10{sup 16} cm{sup −3} phosphorus atoms are electrically active as substitutional donors, which is 60% of all incorporated dopant atoms. These results indicate that P-doped (110)-oriented diamond films deposited at high growth rates are promising candidates for future use in high-power electronic applications.

  7. Homo-epitaxial diamond film growth on ion implanted diamond substrates

    Energy Technology Data Exchange (ETDEWEB)

    Weiser, P.S.; Prawer, S.; Nugent, K.W.; Bettiol, A.A.; Kostidis, L.I.; Jamieson, D.N. [Melbourne Univ., Parkville, VIC (Australia). School of Physics

    1996-12-31

    The nucleation of CVD diamond is a complicated process, governed by many interrelated parameters. In the present work we attempt to elucidate the effect of strain on the growth of a homo-epitaxial CVD diamond. We have employed laterally confined high dose (MeV) Helium ion implantation to produce surface swelling of the substrate. The strain is enhanced by the lateral confinement of the implanted region to squares of 100 x 100 {mu}m{sup 2}. After ion implantation, micro-Raman spectroscopy was employed to map the surface strain. The substrates were then inserted into a CVD reactor and a CVD diamond film was grown upon them. Since the strained regions were laterally confined, it was then possible to monitor the effect of strain on diamond nucleation. The substrates were also analysed using Rutherford Backscattering Spectroscopy (RBS), Proton induced X-ray Emission (PIXE) and Ion Beam induced Luminescence (IBIL). 7 refs., 5 figs.

  8. Homoepitaxial n-core: p-shell gallium nitride nanowires: HVPE overgrowth on MBE nanowires.

    Science.gov (United States)

    Sanders, Aric; Blanchard, Paul; Bertness, Kris; Brubaker, Matthew; Dodson, Christopher; Harvey, Todd; Herrero, Andrew; Rourke, Devin; Schlager, John; Sanford, Norman; Chiaramonti, Ann N; Davydov, Albert; Motayed, Abhishek; Tsvetkov, Denis

    2011-11-18

    We present the homoepitaxial growth of p-type, magnesium doped gallium nitride shells by use of halide vapor phase epitaxy (HVPE) on n-type gallium nitride nanowires grown by plasma-assisted molecular beam epitaxy (MBE). Scanning electron microscopy shows clear dopant contrast between the core and shell of the nanowire. The growth of magnesium doped nanowire shells shows little or no effect on the lattice parameters of the underlying nanowires, as measured by x-ray diffraction (XRD). Photoluminescence measurements of the nanowires show the appearance of sub-bandgap features in the blue and the ultraviolet, indicating the presence of acceptors. Finally, electrical measurements confirm the presence of electrically active holes in the nanowires.

  9. X-ray characterization of GGG homoepitaxial layers with introduced divalent Ni ions

    Energy Technology Data Exchange (ETDEWEB)

    Mazur, K., E-mail: Krystyna.Mazur@itme.edu.pl [Institute of Electronic Materials Technology, 133 Wolczynska Street, 01-919 Warsaw (Poland); Sarnecki, J.; Wierzchowski, W. [Institute of Electronic Materials Technology, 133 Wolczynska Street, 01-919 Warsaw (Poland); Wieteska, K. [Institute of Atomic Energy POLATOM 05-400 Otwock-Swierk (Poland); Turos, A. [Institute of Electronic Materials Technology, 133 Wolczynska Street, 01-919 Warsaw (Poland); Soltan Institute for Nuclear Studies, 05-400 Otwock-Swierk (Poland)

    2011-10-15

    The study of structural perfection of GGG homoepitaxial layers with incorporated divalent Ni ions Ni,Ge:GGG has been performed by means of HR X-ray diffraction and optical spectroscopy. Epitaxial layers were grown by the LPE technique from supercooled high temperature solution with different concentration of NiO and GeO{sub 2} on both sides of the polished <1 1 1> oriented GGG substrates. Incorporation of optically inert Ge{sup 4+} ions made it possible to incorporate Ni{sup 2+} ions in the garnet lattice. High structural perfection and the relevant absorption spectra are prerequisite for the use of Ni,Ge:GGG epitaxial layers as infrared saturable absorbers.

  10. Origin of magnetism in cobalt-doped indium tin oxide thin films

    Science.gov (United States)

    Hakimi, A. M. H. R.; Schoofs, F.; Bali, R.; Stelmashenko, N. A.; Blamire, M. G.; Langridge, S.; Cavill, S. A.; van der Laan, G.; Dhesi, S. S.

    2010-10-01

    We report an x-ray absorption spectroscopy (XAS) and x-ray magnetic circular dichroism (XMCD) study of a 5.4at.% Co-doped indium tin oxide (ITO) thin film shown to exhibit ferromagnetism beyond room temperature. The XAS spectra at the CoL2,3 edge reveal pronounced multiplet features characteristic of divalent octahedrally coordinated Co2+ ions. The results suggest that the Co2+ ions are nonmetallic and substitute for the In site in ITO. Magnetic field and temperature-dependent XMCD spectra imply that the Co2+ ions give a paramagnetic contribution to the overall ferromagnetic response both at the near-surface region and throughout the bulk of the films. No magnetic polarization was detected at the InM2,3 or SnM2,3 edges. We therefore presume that the ferromagnetism observed is a result of the sp-d exchange interaction between the sp band of the host ITO and that of the localized d electrons of the transition-metal Co dopants.

  11. Solution-processed zinc oxide nanoparticles/single-walled carbon nanotubes hybrid thin-film transistors

    Science.gov (United States)

    Liu, Fangmei; Sun, Jia; Qian, Chuan; Hu, Xiaotao; Wu, Han; Huang, Yulan; Yang, Junliang

    2016-09-01

    Solution-processed thin-film transistors (TFTs) are the essential building blocks for manufacturing the low-cost and large-area consumptive electronics. Herein, solution-processed TFTs based on the composites of zinc oxide (ZnO) nanoparticles and single-walled carbon nanotubes (SWCNTs) were fabricated by the methods of spin-coating and doctor-blading. Through controlling the weight of SWCNTs, the ZnO/SWCNTs TFTs fabricated by spin-coating demonstrated a field-effect mobility of 4.7 cm2/Vs and a low threshold voltage of 0.8 V, while the TFTs devices fabricated by doctor-blading technique showed reasonable electrical performance with a mobility of 0.22 cm2/Vs. Furthermore, the ion-gel was used as an efficient electrochemical gate dielectric because of its large electric double-layer capacitance. The operating voltage of all the TFTs devices is as low as 4.0 V. The research suggests that ZnO/SWCNTs TFTs have the potential applications in low-cost, large-area and flexible consumptive electronics, such as chemical-biological sensors and smart label.

  12. Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage

    Science.gov (United States)

    Ali, Faizan; Liu, Xiaohua; Zhou, Dayu; Yang, Xirui; Xu, Jin; Schenk, Tony; Müller, Johannes; Schroeder, Uwe; Cao, Fei; Dong, Xianlin

    2017-10-01

    Motivated by the development of ultracompact electronic devices as miniaturized energy autonomous systems, great research efforts have been expended in recent years to develop various types of nano-structural energy storage components. The electrostatic capacitors characterized by high power density are competitive; however, their implementation in practical devices is limited by the low intrinsic energy storage density (ESD) of linear dielectrics like Al2O3. In this work, a detailed experimental investigation of energy storage properties is presented for 10 nm thick silicon-doped hafnium oxide anti-ferroelectric thin films. Owing to high field induced polarization and slim double hysteresis, an extremely large ESD value of 61.2 J/cm3 is achieved at 4.5 MV/cm with a high efficiency of ˜65%. In addition, the ESD and the efficiency exhibit robust thermal stability in 210-400 K temperature range and an excellent endurance up to 109 times of charge/discharge cycling at a very high electric field of 4.0 MV/cm. The superior energy storage performance together with mature technology of integration into 3-D arrays suggests great promise for this recently discovered anti-ferroelectric material to replace the currently adopted Al2O3 in fabrication of nano-structural supercapacitors.

  13. Tunneling phenomenon of amorphous indium-gallium-zinc-oxide thin film transistors for flexible display

    Science.gov (United States)

    Oh, Teresa

    2015-09-01

    It is an importance to understand the contact mechanism at interfaces between dielectric and channel materials to improve the performance of thin film transistors. Oxide semiconductor has proposed as promising candidate for transparent flexible application, whose development requires greater understand and control of their electron contacts. The performance of IGZO/SiOC TFTs depended on properties of SiOC as a gate insulator. SiOC exhibited a range of systematic interface electronic structure that can be understood at the atomic scale to provide a comprehensive feature of Schottky barrier and Ohmic contacts. The conduction of TFTs prepared on low polar SiOC was progressed by the tunneling behavior. The ambipolar transfer characteristics in tunneling transistors were done by a spontaneous potential barrier of SiOC such as the Schottky barrier (SB) in a short range and Ohmic contact in a long range. TFTs on SiOC with Poole-Frenkel contact as high SB operated under the threshold voltage, and then became free from the threshold voltage shift. However, the TFTs on high polar SiOC with Ohmic contact in a short range was also showed the unipolar characteristics by the trapping behavior as well as instability owing to the operation at high drain bias voltage over the threshold voltage. [Figure not available: see fulltext.

  14. Fatigue mechanism of yttrium-doped hafnium oxide ferroelectric thin films fabricated by pulsed laser deposition.

    Science.gov (United States)

    Huang, Fei; Chen, Xing; Liang, Xiao; Qin, Jun; Zhang, Yan; Huang, Taixing; Wang, Zhuo; Peng, Bo; Zhou, Peiheng; Lu, Haipeng; Zhang, Li; Deng, Longjiang; Liu, Ming; Liu, Qi; Tian, He; Bi, Lei

    2017-02-01

    Owing to their prominent stability and CMOS compatibility, HfO2-based ferroelectric films have attracted great attention as promising candidates for ferroelectric random-access memory applications. A major reliability issue for HfO2 based ferroelectric devices is fatigue. So far, there have been a few studies on the fatigue mechanism of this material. Here, we report a systematic study of the fatigue mechanism of yttrium-doped hafnium oxide (HYO) ferroelectric thin films deposited by pulsed laser deposition. The influence of pulse width, pulse amplitude and temperature on the fatigue behavior of HYO during field cycling is studied. The temperature dependent conduction mechanism is characterized after different fatigue cycles. Domain wall pinning caused by carrier injection at shallow defect centers is found to be the major fatigue mechanism of this material. The fatigued device can fully recover to the fatigue-free state after being heated at 90 °C for 30 min, confirming the shallow trap characteristic of the domain wall pinning defects.

  15. A physics-based model of threshold voltage for amorphous oxide semiconductor thin-film transistors

    Science.gov (United States)

    Chen, Chi-Le; Chen, Wei-Feng; Zhou, Lei; Wu, Wei-Jing; Xu, Miao; Wang, Lei; Peng, Jun-Biao

    2016-03-01

    In the application of the Lambert W function, the surface potential for amorphous oxide semiconductor thin-film transistors (AOS TFTs) under the subthreshold region is approximated by an asymptotic equation only considering the tail states. While the surface potential under the above-threshold region is approximated by another asymptotic equation only considering the free carriers. The intersection point between these two asymptotic equations represents the transition from the weak accumulation to the strong accumulation. Therefore, the gate voltage corresponding to the intersection point is defined as threshold voltage of AOS TFTs. As a result, an analytical expression for the threshold voltage is derived from this novel definition. It is shown that the threshold voltage achieved by the proposed physics-based model is agreeable with that extracted by the conventional linear extrapolation method. Furthermore, we find that the free charge per unit area in the channel starts increasing sharply from the threshold voltage point, where the concentration of the free carriers is a little larger than that of the localized carriers. The proposed model for the threshold voltage of AOS TFTs is not only physically meaningful but also mathematically convenient, so it is expected to be useful for characterizing and modeling AOS TFTs.

  16. A physics-based model of threshold voltage for amorphous oxide semiconductor thin-film transistors

    Directory of Open Access Journals (Sweden)

    Chi-Le Chen

    2016-03-01

    Full Text Available In the application of the Lambert W function, the surface potential for amorphous oxide semiconductor thin-film transistors (AOS TFTs under the subthreshold region is approximated by an asymptotic equation only considering the tail states. While the surface potential under the above-threshold region is approximated by another asymptotic equation only considering the free carriers. The intersection point between these two asymptotic equations represents the transition from the weak accumulation to the strong accumulation. Therefore, the gate voltage corresponding to the intersection point is defined as threshold voltage of AOS TFTs. As a result, an analytical expression for the threshold voltage is derived from this novel definition. It is shown that the threshold voltage achieved by the proposed physics-based model is agreeable with that extracted by the conventional linear extrapolation method. Furthermore, we find that the free charge per unit area in the channel starts increasing sharply from the threshold voltage point, where the concentration of the free carriers is a little larger than that of the localized carriers. The proposed model for the threshold voltage of AOS TFTs is not only physically meaningful but also mathematically convenient, so it is expected to be useful for characterizing and modeling AOS TFTs.

  17. Investigation of solution combustion-processed nickel oxide p-channel thin film transistors

    Science.gov (United States)

    Li, Ya; Liu, Chuan; Wang, Gang; Pei, Yanli

    2017-08-01

    In this work, p-channel thin film transistors (TFTs) with a nickel oxide (NiO) active layer have been synthesized by a solution combustion process. The effect of synthesis parameters was investigated. It was revealed that the metal-acetylacetone complexes and metal-ammine complexes coexist in the solution precursor. The combustion of metal-acetylacetone complexes is dominant in the redox reaction, while the combustion of metal-ammine complexes completes the reaction of residual organic matter. The proportion of both complexes in the solution precursor is key for NiO synthesis, which is tunable by the precursor aging time. The annealing temperature is another key parameter. X-ray photoelectron spectroscopy analysis indicates that organic residues exist in the film annealed at low temperature. In contrast, with the increase in annealing temperature, the Ni3+-related components decreased while the intensity of Ni2+ in the film increased. This results in a decrease in the hole concentration and the degradation of device performance. The p-channel NiO TFTs with a field-effect mobility of 0.015 cm2 V-1 s-1 have been achieved via systemically optimizing precursor aging time and post-annealing temperature. This study successfully demonstrates the potential of combustion solution-processed NiO TFTs with p-channel characteristics.

  18. Visible emission from bismuth-doped yttrium oxide thin films for lighting and display applications.

    Science.gov (United States)

    Scarangella, Adriana; Fabbri, Filippo; Reitano, Riccardo; Rossi, Francesca; Priolo, Francesco; Miritello, Maria

    2017-12-11

    Due to the great development of light sources for several applications from displays to lighting, great efforts are devoted to find stable and efficient visible emitting materials. Moreover, the requirement of Si compatibility could enlarge the range of applications inside microelectronic chips. In this scenario, we have studied the emission properties of bismuth doped yttrium oxide thin films grown on crystalline silicon. Under optical pumping at room temperature a stable and strong visible luminescence has been observed. In particular, by the involvement of Bi ions in the two available lattice sites, the emission can be tuned from violet to green by changing the excitation wavelength. Moreover, under electron beam at low accelerating voltages (3 keV) a blue emission with high efficiency and excellent stability has been recorded. The color is generated by the involvement of Bi ions in both the lattice sites. These peculiarities make this material interesting as a luminescent medium for applications in light emitting devices and field emission displays by opening new perspectives for the realization of silicon-technology compatible light sources operating at room temperature.

  19. Silica-Copper Oxide Composite Thin Films as Solar Selective Coatings Prepared by Dipping Sol Gel

    Directory of Open Access Journals (Sweden)

    E. Barrera-Calva

    2008-01-01

    Full Text Available Silica-copper oxide (silica-CuO composite thin films were prepared by a dipping sol-gel route using ethanolic solutions comprised TEOS and a copper-propionate complex. Sols with different TEOS/Cu-propionate (Si/Cu molar ratios were prepared and applied on stainless steel substrates using dipping process. During the annealing process, copper-propionate complexes developed into particulate polycrystalline CuO dispersed in a partially crystallized silica matrix, as indicated by the X-ray diffraction (XRD and X-ray photoelectron spectroscopy (XPS analyses. The gel thermal analysis revealed that the prepared material might be stable up to 400°C. The silica-CuO/stainless steel system was characterized as a selective absorber surface and its solar selectivity parameters, absorptance (α, and emittance (ε were evaluated from UV-NIR reflectance data. The solar parameters of such a system were mostly affected by the thickness and phase composition of the SiO2-CuO film. Interestingly, the best solar parameters (α = 0.92 and ε = 0.2 were associated to the thinnest films, which comprised a CuO-Cu2O mixture immersed in the silica matrix, as indicated by XPS.

  20. Mechanical properties and scratch resistance of filtered-arc-deposited titanium oxide thin films on glass

    Energy Technology Data Exchange (ETDEWEB)

    Borrero-Lopez, Oscar, E-mail: oborlop@unex.es [Departamento de Ingenieria Mecanica, Energetica y de los Materiales, Universidad de Extremadura, 06071, Badajoz (Spain); School of Materials Science and Engineering, University of New South Wales NSW 2052, Sydney (Australia); Hoffman, Mark [School of Materials Science and Engineering, University of New South Wales NSW 2052, Sydney (Australia); Bendavid, Avi; Martin, Phil J. [CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield NSW 2070 (Australia)

    2011-09-01

    The mechanical properties and the scratch resistance of titanium oxide (TiO{sub 2}) thin films on a glass substrate have been investigated. Three films, with crystalline (rutile and anatase) and amorphous structures, were deposited by the filtered cathodic vacuum arc deposition technique on glass, and characterized by means of nanoindentation and scratch tests. The different damage modes (arc-like, longitudinal and channel cracks in the crystalline films; Hertzian cracks in the amorphous film) were assessed by means of optical and focused ion beam microscopy. In all cases, the deposition of the TiO{sub 2} film improved the contact-mechanical properties of uncoated glass. Crystalline films were found to possess a better combination of mechanical properties (i.e. elastic modulus up to 221 GPa, hardness up to 21 GPa, and fracture strength up to 3.6 GPa) than the amorphous film. However, under cyclic sliding contact above the critical fracture load, the amorphous film was found to withstand a higher number of cycles. The results are expected to provide useful insight for the design of optical coatings with improved contact-damage resistance.

  1. Electrical properties of magnesium incorporated zinc tin oxide thin film transistors by solution process.

    Science.gov (United States)

    Jeon, In Young; Lee, Ji Yoon; Yoon, Dae Ho

    2013-03-01

    Zinc tin oxide (ZTO) films were fabricated on SiO2/Si substrate as a function of Mg concentration (the ratio of 3 to 10 atomic%) using a spin-coating process. For the characterization of thin film transistors (TFTs), Zn0.3Sn0.70 channel TFT exhibited a higher on/off ratio compared to Zn0.5 Sn.0.5O channel TFT because the higher Sn concentration can induce more charge carriers. 3 atomic% Mg incorporated Zn0.3Sn0.7O channel TFTs showed stable electrical performances such as I(on/off) - 1 x 10(7), micro(sat) = 1.40 cm2 V(-1) s(-1), and S = 0.39 V/decade. However, 10 atomic% Mg incorporated Zn0.3Sn0.7O channel TFTs deteriorated their electrical performances due to Mg segregation. The Mg incorporated Zn0.3Sn0.7O channel TFTs effectively suppress off-current and threshold voltage change during positive gate bias stress due to their strong bonding with oxygen.

  2. Effect of an organic buffer layer on the stability of zinc oxide thin-film transistors.

    Science.gov (United States)

    Lee, H W; Hyung, G W; Koo, J R; Cho, E S; Kwon, S J; Park, J H; Kim, Y K

    2014-07-01

    Compared with other materials, zinc oxide (ZnO) exhibits stability in air, high-electron mobility, transparency and low light sensitivity. We investigated these properties in ZnO thin-film transistors (TFTs) containing a cross-linked poly(vinyl alcohol) (C-PVA) (1:3) buffer layer stacked between the semiconductor and gate dielectric. We measured the impact of this C-PVA layer on gate bias stress. We measured the transfer characteristics of the saturation region to determine the threshold voltage and the field-effect mobility of the transistors. We recorded a threshold voltage of 11.53 V in the ZnO TFTs with the C-PVA buffer layer, the field-effect mobility was 0.2 cm2/Vs. There was a positive shift in the threshold voltage of deltaV(TH) approximately 10 V in response to the application of a gate bias stress of 20 V. The positive shift in the threshold voltage was lower than that in pristine ZnO TFTs. This finding suggests that the shift in threshold voltage was due to reduced charge trapping at the semiconductor-gate dielectric interface. Our report indicates that the organic buffer layer enhanced the stability of ZnO TFTs.

  3. High mobility indium zinc oxide thin film field-effect transistors by semiconductor layer engineering.

    Science.gov (United States)

    Walker, Daniel E; Major, Marton; Yazdi, Mehrdad Baghaie; Klyszcz, Andreas; Haeming, Marc; Bonrad, Klaus; Melzer, Christian; Donner, Wolfgang; von Seggern, Heinz

    2012-12-01

    Indium zinc oxide thin-film transistors are fabricated via a precursor in solution route on silicon substrates with silicon dioxide gate dielectric. It is found that the extracted mobility rises, peaks, and then decreases with increasing precursor concentration instead of rising and saturating. Investigation with scanning probe techniques reveals full thickness variations within the film which are assumed to adversely affect charge transport. Additional layers are coated, and the extracted mobility is observed to increase up to 19.7 cm(2) V(-1) s(-1). The reasons for this are examined in detail by direct imaging with scanning tunneling microscopy and extracting electron density profiles from X-ray reflection measurements. It is found that the optimal concentration for single layer films is suboptimal when coating multiple layers and in fact using many layers of very low concentrations of precursor in the solution, leading to a dense, defect and void free film, affording the highest mobilities. A consistent qualitative model of layer formation is developed explaining how the morphology of the film develops as the concentration of precursor in the initial solution is varied.

  4. Optical properties of tungsten oxide thin films by non-reactive sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Acosta, M., E-mail: milenis@yahoo.co [Laboratorio de Ciencia de Materiales, Facultad de Ingenieria, Universidad Autonoma de Yucatan, Avenida Industrias No Contaminantes S/N, A.P. 150, Cordemex, Merida (Mexico); Gonzalez, D.; Riech, I. [Laboratorio de Ciencia de Materiales, Facultad de Ingenieria, Universidad Autonoma de Yucatan, Avenida Industrias No Contaminantes S/N, A.P. 150, Cordemex, Merida (Mexico)

    2009-07-31

    Tungsten oxide thin films were grown on glass substrates by RF sputtering at room temperature using a tungsten trioxide target for several values of the argon pressure (P{sub Ar}). The structural and morphological properties of these films were studied using X-ray diffraction and atomic force microscopy. The as-deposited films were amorphous irrespective of the argon pressure, and crystallized in a mixture of hexagonal and monoclinic phases after annealing at a temperature of 350 {sup o}C in air. Surface-roughness increased by an order of magnitude (from 1 nm to 20 nm) after thermal treatment. The argon pressure, however, had a strong influence on the optical properties of the films. Three different regions are clearly identified: deep blue films for P{sub Ar} {<=} 2.67 Pa with low transmittance values, light blue films for 2.67 Pa < P{sub Ar} < 6 Pa with intermediate transmittance values and transparent films for P{sub Ar} {>=} 6 Pa with high transmittance values. We suggest that the observed changes in optical properties are due to an increasing number of oxygen vacancies as the growth argon pressure decreases.

  5. Significant Enhancement in the Conductivity of Al-Doped Zinc Oxide thin Films for TCO Application

    Science.gov (United States)

    Mohite, R. M.; Ansari, J. N.; Roy, A. S.; Kothawale, R. R.

    2016-03-01

    Nanostructured Al-doped Zinc oxide (ZnO) thin films were deposited on glass substrate by chemical bath deposition (CBD) using aqueous zinc nitrate solution and subjected for different characterizations. Effect of Al3+ substitution on the properties of ZnO annealed at 400∘C was studied by XRD and UV-Vis for structural studies, SEM and TEM for surface morphology and DC four probe resistivity measurements for electrical properties. Al3+ substitution does not influence the morphology and well-known peaks related to wurtzite structure of ZnO. Electron microscopy (SEM and TEM) confirms rod shaped Al-doped ZnO nanocrystals with average width of 50nm. The optical band gap determined by UV-Visible spectroscopy was found to be in the range 3.37eV to 3.44eV. An EPR spectrum of AZO reveals peak at g=1.96 is due to shallow donors Zn interstitial. The DC electrical resistivity measurements of Al-doped ZnO show a minimum resistivity of 3.77×10-2Ω-cm. Therefore, these samples have potential use in n-type window layer in optoelectronic devices, organic solar cells, photonic crystals, photo-detectors, light emitting diodes (LEDs), gas sensors and chemical sensors.

  6. Chromium and Ruthenium-Doped Zinc Oxide Thin Films for Propane Sensing Applications

    Directory of Open Access Journals (Sweden)

    Maximino Avendaño-Alejo

    2013-03-01

    Full Text Available Chromium and ruthenium-doped zinc oxide (ZnO:Cr and (ZnO:Ru thin solid films were deposited on soda-lime glass substrates by the sol-gel dip-coating method. A 0.6 M solution of zinc acetate dihydrate dissolved in 2-methoxyethanol and monoethanolamine was used as basic solution. Chromium (III acetylacetonate and Ruthenium (III trichloride were used as doping sources. The Ru incorporation and its distribution profile into the films were proved by the SIMS technique. The morphology and structure of the films were studied by SEM microscopy and X-ray diffraction measurements, respectively. The SEM images show porous surfaces covered by small grains with different grain size, depending on the doping element, and the immersions number into the doping solutions. The sensing properties of ZnO:Cr and ZnO:Ru films in a propane (C3H8 atmosphere, as a function of the immersions number in the doping solution, have been studied in the present work. The highest sensitivity values were obtained for films doped from five immersions, 5.8 and 900, for ZnO:Cr and ZnO:Ru films, respectively. In order to evidence the catalytic effect of the chromium (Cr and ruthenium (Ru, the sensing characteristics of undoped ZnO films are reported as well.

  7. Organic Thin Film Transistors with Polyvinylpyrrolidone / Nickel Oxide Sol-Gel Derived Nanocomposite Insulator

    Directory of Open Access Journals (Sweden)

    A. Bahari

    2012-09-01

    Full Text Available Polyvinylpyrrolidone  /  Nickel  oxide  (PVP/NiO  dielectrics  were fabricated  with  sol-gel  method  using  0.2  g  of  PVP  at  different working  temperatures  of  80,  150  and  200  ºC.  Structural  properties and surface morphology of the hybrid films were investigated by X- Ray  diffraction  (XRD  and  Scanning  Electron Microscope  (SEM respectively. Energy dispersive X-ray spectroscopy (EDX was used to make  a  quantitative  chemical  analysis  of  an  unknown material. The  obtained  results  demonstrate  the  feasibility  of  using  high dielectric  constant  nanocomposite  PVP/NiO  as  gate  dielectric insulator in the organic thin film transistors (OTFTs.

  8. Biofouling Mitigation in Forward Osmosis Using Graphene Oxide Functionalized Thin-Film Composite Membranes.

    Science.gov (United States)

    Perreault, François; Jaramillo, Humberto; Xie, Ming; Ude, Mercy; Nghiem, Long D; Elimelech, Menachem

    2016-06-07

    Forward osmosis (FO) is an emerging membrane process with potential applications in the treatment of highly fouling feedwaters. However, biofouling, the adhesion of microorganisms to the membrane and the subsequent formation of biofilms, remains a major limitation since antifouling membrane modifications offer limited protection against biofouling. In this study, we evaluated the use of graphene oxide (GO) for biofouling mitigation in FO. GO functionalization of thin-film composite membranes (GO-TFC) increased the surface hydrophilicity and imparted antimicrobial activity to the membrane without altering its transport properties. After 1 h of contact time, deposition and viability of Pseudomonas aeruginosa cells on GO-TFC were reduced by 36% and 30%, respectively, compared to pristine membranes. When GO-TFC membranes were tested for treatment of an artificial secondary wastewater supplemented with P. aeruginosa, membrane biofouling was reduced by 50% after 24 h of operation. This biofouling resistance is attributed to the reduced accumulation of microbial biomass on GO-TFC compared to pristine membranes. In addition, confocal microscopy demonstrated that cells deposited on the membrane surface are inactivated, resulting in a layer of dead cells on GO-TFC that limit biofilm formation. These findings highlight the potential of GO to be used for biofouling mitigation in FO.

  9. Investigation into the optoelectrical properties of tungsten oxide thin films annealed in an oxygen air

    Energy Technology Data Exchange (ETDEWEB)

    Arfaoui, A.; Ouni, B., E-mail: Bachir.ouni@laposte.net; Touihri, S.; Mannoubi, T.

    2014-12-15

    Tungsten oxide (WO{sub x}) thin film have been deposited onto glass substrates using the thermal vacuum evaporation technique, monitored by an annealing process in a variable oxygen atmosphere. Analysis by X-ray diffraction and Raman spectroscopy showed the structural changes from orthorhombic to monoclinic which depend on the annealing temperature and the oxygen content. AFM study shows that the increase of oxygen content leads to a decrease of the root-mean-square from 94.64 nm to 2 nm. Ellipsometric measurements have been used to evaluate the optical constants. Further, it is found that when the oxygen content increases, the band gap of the annealed layer varies from 3.01 eV to 3.52 eV by against, the Urbach energy decreases. The AC conductivity plot showed a universal power law according to the Jonscher model. Moreover, at high frequency semiconductor-to-metallic behavior has been observed. Finally, the effect of annealing in oxygen atmosphere on their structural modifications, morphological, optical properties and electrical conductivity are reported.

  10. Structural and spectroscopic analysis of ex-situ annealed RF sputtered aluminium doped zinc oxide thin films

    Science.gov (United States)

    Otieno, Francis; Airo, Mildred; Erasmus, Rudolph M.; Billing, David G.; Quandt, Alexander; Wamwangi, Daniel

    2017-08-01

    Aluminium doped zinc oxide thin films are prepared by Radio Frequency magnetron sputtering in pure argon atmosphere at 100 W. The structural results reveal good film adhesion on a silicon substrate (001). The thin films were then subjected to heat treatment in a furnace under ambient air. The structural, morphological, and optical properties of the thin films as a function of deposition time and annealing temperatures have been investigated using Grazing incidence X-Ray Diffraction (GIXRD), Atomic Force Microscopy, and Scanning Electronic Microscopy. The photoluminescence properties of the annealed films showed significant changes in the optical properties attributed to mid gap defects. Annealing increases the crystallite size and the roughness of the film. The crystallinity of the films also improved as evident from the Raman and XRD studies.

  11. Characterization and Gas Sensing Properties of Copper-doped Tin Oxide Thin Films Deposited by Ultrasonic Spray Pyrolysis

    Directory of Open Access Journals (Sweden)

    Zhaoxia ZHAI

    2016-05-01

    Full Text Available Tin oxide-based thin films are deposited by ultrasonic spray pyrolysis technology, in which Cu addition is introduced to enhance the gas sensing performance by H2S detection. The thin films are porous and comprise nano-sized crystallites. One of the Cu-containing thin film sensors demonstrates a fast and significant response to H2S gas. The values of power law exponent n are calculated to discuss the sensitivity of the sensors, which is significantly promoted by Cu additive. The sensitivity of Cu-doped SnO2 gas sensors is determined by two mechanisms. One is the normal gas sensing mechanism of SnO2 grains, and the other is the promoted mechanism caused by the transformation between CuO and CuS in the H2S detection. DOI: http://dx.doi.org/10.5755/j01.ms.22.2.12917

  12. Transparent conducting oxide contacts and textured metal back reflectors for thin film silicon solar cells

    Science.gov (United States)

    Franken, R. H.-J.

    2006-09-01

    With the growing population and the increasing environmental problems of the 'common' fossil and nuclear energy production, the need for clean and sustainable energy sources is evident. Solar energy conversion, such as in photovoltaic (PV) systems, can play a major role in the urgently needed energy transition in electricity production. At the present time PV module production is dominated by the crystalline wafer technology. Thin film silicon technology is an alternative solar energy technology that operates at lower efficiencies, however, it has several significant advantages, such as the possibility of deposition on cheap (flexible) substrates and the much smaller silicon material consumption. Because of the small thickness of the solar cells, light trapping schemes are needed in order to obtain enough light absorption and current generation. This thesis describes the research on thin film silicon solar cells with the focus on the optimization of the transparent conducting oxide (TCO) layers and textured metal Ag substrate layers for the use as enhanced light scattering back reflectors in n-i-p type of solar cells. First we analyzed ZnO:Al (TCO) layers deposited in an radio frequent (rf) magnetron deposition system equipped with a 7 inch target. We have focused on the improvement of the electrical properties without sacrificing the optical properties by increasing the mobility and decreasing the grain boundary density. Furthermore, we described some of the effects on light trapping of ZnO:Al enhanced back reflectors. The described effects are able to explain the observed experimental data. Furthermore, we present a relation between the surface morphology of the Ag back contact and the current enhancement in microcrystalline (muc-Si:H) solar cells. We show the importance of the lateral feature sizes of the Ag surface on the light scattering and introduce a method to characterize the quality of the back reflector by combining the vertical and lateral feature sizes

  13. Anisotropy, band-to-band transitions, phonon modes, and oxidation properties of cobalt-oxide core-shell slanted columnar thin films

    Energy Technology Data Exchange (ETDEWEB)

    Mock, Alyssa, E-mail: amock@huskers.unl.edu; Korlacki, Rafał; Briley, Chad; Sekora, Derek; Schubert, Eva; Schubert, Mathias [Department of Electrical and Computer Engineering and Center for Nanohybrid Functional Materials, University of Nebraska-Lincoln, Lincoln, Nebraska 68588 (United States); Hofmann, Tino [Department of Electrical and Computer Engineering and Center for Nanohybrid Functional Materials, University of Nebraska-Lincoln, Lincoln, Nebraska 68588 (United States); Department of Physics, Chemistry, and Biology, Linköping University, 58183 Linköping (Sweden); Wilson, Peter; Sinitskii, Alexander [Department of Chemistry and Center for Nanohybrid Functional Materials, University of Nebraska-Lincoln, Lincoln, Nebraska 68588 (United States)

    2016-02-01

    Highly ordered and spatially coherent cobalt slanted columnar thin films (SCTFs) were deposited by glancing angle deposition onto silicon substrates, and subsequently oxidized by annealing at 475 °C. Scanning electron microscopy, Raman scattering, generalized ellipsometry, and density functional theory investigations reveal shape-invariant transformation of the slanted nanocolumns from metallic to transparent metal-oxide core-shell structures with properties characteristic of spinel cobalt oxide. We find passivation of Co-SCTFs yielding Co-Al{sub 2}O{sub 3} core-shell structures produced by conformal deposition of a few nanometers of alumina using atomic layer deposition fully prevents cobalt oxidation in ambient and from annealing up to 475 °C.

  14. Chemical stability and electrical performance of dual-active-layered zinc-tin-oxide/indium-gallium-zinc-oxide thin-film transistors using a solution process.

    Science.gov (United States)

    Kim, Chul Ho; Rim, You Seung; Kim, Hyun Jae

    2013-07-10

    We investigated the chemical stability and electrical properties of dual-active-layered zinc-tin-oxide (ZTO)/indium-gallium-zinc-oxide (IGZO) structures (DALZI) with the durability of the chemical damage. The IGZO film was easily corroded or removed by an etchant, but the DALZI film was effectively protected by the high chemical stability of ZTO. Furthermore, the electrical performance of the DALZI thin-film transistor (TFT) was improved by densification compared to the IGZO TFT owing to the passivation of the pin holes or pore sites and the increase in the carrier concentration due to the effect of Sn(4+) doping.

  15. Tungsten oxide thin film bombarded with a low energy He ion beam: evidence for a reduced erosion and W enrichment

    Science.gov (United States)

    Martin, C.; Hijazi, H.; Addab, Y.; Domenichini, B.; Bannister, M. E.; Meyer, F. W.; Pardanaud, C.; Giacometti, G.; Cabié, M.; Roubin, P.

    2017-12-01

    Nanocrystalline tungsten oxide (WO3) thin films synthesized by thermal oxidation of tungsten substrates were exposed to low energy helium ions (energy: 80 eV; flux: 1.4-1.7 × 1020 m-2 s-1) at room temperature and at 673 K. The structure and morphology changes of the oxide were studied using Raman spectroscopy and electron microscopy. Due to the low ion energy, no erosion is observed at room temperature. In contrast, at 673 K, a color change is observed and a significant erosion is measured (˜70 nm for a fluence of ˜4 × 1021 m-2) due to a synergetic effect between ion bombardment and heating. We show that erosion processes and structural changes strongly depend on the ion fluence and in particular the higher the fluence, the lower the erosion yield, most likely due to oxygen depletion in the oxide near-surface layers.

  16. Room temperature air oxidation of nanostructured Si thin films with varying porosities as studied by x-ray photoelectron spectroscopy

    Science.gov (United States)

    Yang, D.-Q.; Meunier, M.; Sacher, E.

    2006-04-01

    The room temperature air oxidation of nanostructured Si thin films, with varying porosities, has been followed by x-ray photoelectron spectroscopy (XPS), using films deposited by KrF excimer (248 nm) laser ablation in He gas ambients. The overall oxidation, determined from the Si2p XPS spectrum, was shown to be amenable to time-porosity superposition, with the extracted shift factors indicating that oxidation is controlled by the permeability of air in the pores. A model has been developed to describe the room temperature air oxidation process as a function of time and porosity, in accord with the experimental findings. Efforts to determine O:Si atomic ratios from O1s:Si2p spectral ratios have revealed the effect of porosity on both the photoelectron attenuation lengths and the size-dependent photoemission intensities of the nanoparticles that compose the samples.

  17. Ultrashort pulse laser patterning of indium tin oxide thin films on glass by uniform diffractive beam patterns

    Science.gov (United States)

    Kuang, Zheng; Perrie, Walter; Liu, Dun; Fitzsimons, Paul; Edwardson, Stuart P.; Fearon, Eamonn; Dearden, Geoff; Watkins, Ken G.

    2012-07-01

    In the last decade, indium tin oxide (ITO) has been most commonly employed to create transparent conducting oxides (TCOs) thin films for many industrial applications. It is usually necessary to pattern ITO thin films to create functional structures for specific applications. Direct-write micro-patterning of ITO thin films by ultra-short pulse lasers has demonstrated high quality without requiring multiple processing stations, compared with conventional patterning technologies (e.g. wet-etch lithography). However, the processing efficiency and throughput with a single beam can be insufficient because of the high level of attenuation needed for the output to meet the required ‘thermal-free' parameters. In this paper, high throughput surface direct micro-structuring of ITO on glass is demonstrated by parallel processing using diffractive multiple ultrashort pulse laser beams (λ = 1064 nm, τp = 10 ps). By avoiding periodic and symmetrical geometry design, the diffractive multiple beam pattern generated by a spatial light modulator has high uniformity (the energy variation between each diffractive beam is thin film is removed by laser ablation of 25 identical beams at the same time without any damage to the glass substrate. Additionally, by synchronizing a scanning galvanometer, the processing demonstrates high flexibility to generate various surface patterns.

  18. Ultrashort pulse laser patterning of indium tin oxide thin films on glass by uniform diffractive beam patterns

    Energy Technology Data Exchange (ETDEWEB)

    Kuang Zheng, E-mail: z.kuang@liv.ac.uk [Laser Group, School of Engineering, University of Liverpool, Brownlow Street, Liverpool L69 3GQ (United Kingdom); Perrie, Walter; Liu Dun; Fitzsimons, Paul; Edwardson, Stuart P.; Fearon, Eamonn; Dearden, Geoff; Watkins, Ken G. [Laser Group, School of Engineering, University of Liverpool, Brownlow Street, Liverpool L69 3GQ (United Kingdom)

    2012-07-15

    In the last decade, indium tin oxide (ITO) has been most commonly employed to create transparent conducting oxides (TCOs) thin films for many industrial applications. It is usually necessary to pattern ITO thin films to create functional structures for specific applications. Direct-write micro-patterning of ITO thin films by ultra-short pulse lasers has demonstrated high quality without requiring multiple processing stations, compared with conventional patterning technologies (e.g. wet-etch lithography). However, the processing efficiency and throughput with a single beam can be insufficient because of the high level of attenuation needed for the output to meet the required 'thermal-free' parameters. In this paper, high throughput surface direct micro-structuring of ITO on glass is demonstrated by parallel processing using diffractive multiple ultrashort pulse laser beams ({lambda} = 1064 nm, {tau}p = 10 ps). By avoiding periodic and symmetrical geometry design, the diffractive multiple beam pattern generated by a spatial light modulator has high uniformity (the energy variation between each diffractive beam is <9%). The ITO thin film is removed by laser ablation of 25 identical beams at the same time without any damage to the glass substrate. Additionally, by synchronizing a scanning galvanometer, the processing demonstrates high flexibility to generate various surface patterns.

  19. Study of the optical response of phase-change recording layer with zinc oxide nanostructured thin film.

    Science.gov (United States)

    Kao, T S; Fu, Y H; Hsu, H W; Tsai, D P

    2008-03-01

    Recently, use of nanostructured materials as a near-field optical active layer has attracted a lot of interest. The non-linear optical properties and strong enhancements of metallic oxide nanostructured thin films are key functions in applications of promising nanophotonics. For the importance of ultra-high density optical data storage, we continue investigating the ultra-high density recording property of near-field optical disk consisting of zinc oxide (ZnO(x)) nanostructured thin film. A carrier-to-noise ratio above 38 dB at a recording mark size of 100 nm can be obtained in the ZnO(x) near-field optical disk by a DVD driver tester directly. In this article, we use an optical pump-probe system (static media tester) to measure the optical response of a phase-change recording layer (Ge(2)Sb(2)Te(5)) and demonstrate the high contrast of optical recording with a ZnO(x) nanostructured thin film in short pulse durations. Also, we investigate the dependence of writing power and the optical response in conventional re-writable recording layers and the phase-change material with ZnO(x) nanostructured thin film.

  20. Optical and structural properties of nanostructured copper oxide thin films as solar selective coating prepared by spray pyrolysis method

    Directory of Open Access Journals (Sweden)

    Asadi M.

    2017-07-01

    Full Text Available Copper (II oxide thin films were prepared by spray pyrolysis method on soda-lime glass substrates using copper acetate precursor solution. Influence of substrate temperature on structural and optical properties was investigated. Structural analysis of these layers were carried out by X-ray diffraction (XRD. Single phase nature and high crystallinity of CuO nanostructures were observed on XRD patterns. The general appearance of the films was uniform and black in color. FT-IR transmittance spectra confirmed the results from the XRD study. Selective solar absorber coatings of copper oxide (CuO on stainless steel substrates was prepared by spray pyrolysis method. Effect of deposition temperature on optical properties of thin films was investigated. Optical parameters, absorbance (α and emittance (α were evaluated from reflectance data. It can be deduced that the porous structure, such as a light traps, can greatly enhance absorbance, while the composition, thickness and roughness of thin films can greatly influence the emissivity. Single phase nature and high crystallinity of CuO nanostructures were observed by XRD patterns. Solar absorbance of thin films were in the range of 85 % to 92 %.

  1. Thin film complementary metal oxide semiconductor (CMOS) device using a single-step deposition of the channel layer

    KAUST Repository

    Nayak, Pradipta K.

    2014-04-14

    We report, for the first time, the use of a single step deposition of semiconductor channel layer to simultaneously achieve both n-and p-type transport in transparent oxide thin film transistors (TFTs). This effect is achieved by controlling the concentration of hydroxyl groups (OH-groups) in the underlying gate dielectrics. The semiconducting tin oxide layer was deposited at room temperature, and the maximum device fabrication temperature was 350C. Both n and p-type TFTs showed fairly comparable performance. A functional CMOS inverter was fabricated using this novel scheme, indicating the potential use of our approach for various practical applications.

  2. Generation of metallic plasmon nanostructures in a thin transparent photosensitive copper oxide film by femtosecond thermochemical decomposition

    Science.gov (United States)

    Danilov, P. A.; Zayarny, D. A.; Ionin, A. A.; Kudryashov, S. I.; Litovko, E. P.; Mel'nik, N. N.; Rudenko, A. A.; Saraeva, I. N.; Umanskaya, S. P.; Khmelnitskii, R. A.

    2017-09-01

    Irradiation of optically transparent copper (I) oxide film covering a glass substrate with a tightly focused femtosecond laser pulses in the pre-ablation regime leads to film reduction to a metallic colloidal state via a single-photon absorption and its subsequent thermochemical decomposition. This effect was demonstrated by the corresponding measurement of the extinction spectrum in visible spectral range. The laser-induced formation of metallic copper nanoparticles in the focal region inside the bulk oxide film allows direct recording of individual thin-film plasmon nanostructures and optical-range metasurfaces.

  3. Aqueous combustion synthesis of aluminum oxide thin films and application as gate dielectric in GZTO solution-based TFTs.

    Science.gov (United States)

    Branquinho, Rita; Salgueiro, Daniela; Santos, Lídia; Barquinha, Pedro; Pereira, Luís; Martins, Rodrigo; Fortunato, Elvira

    2014-11-26

    Solution processing has been recently considered as an option when trying to reduce the costs associated with deposition under vacuum. In this context, most of the research efforts have been centered in the development of the semiconductors processes nevertheless the development of the most suitable dielectrics for oxide based transistors is as relevant as the semiconductor layer itself. In this work we explore the solution combustion synthesis and report on a completely new and green route for the preparation of amorphous aluminum oxide thin films; introducing water as solvent. Optimized dielectric layers were obtained for a water based precursor solution with 0.1 M concentration and demonstrated high capacitance, 625 nF cm(-2) at 10 kHz, and a permittivity of 7.1. These thin films were successfully applied as gate dielectric in solution processed gallium-zinc-tin oxide (GZTO) thin film transistors (TFTs) yielding good electrical performance such as subthreshold slope of about 0.3 V dec(-1) and mobility above 1.3 cm2 V(-1) s(-1).

  4. Flexible and High-Performance Amorphous Indium Zinc Oxide Thin-Film Transistor Using Low-Temperature Atomic Layer Deposition.

    Science.gov (United States)

    Sheng, Jiazhen; Lee, Hwan-Jae; Oh, Saeroonter; Park, Jin-Seong

    2016-12-14

    Amorphous indium zinc oxide (IZO) thin films were deposited at different temperatures, by atomic layer deposition (ALD) using [1,1,1-trimethyl-N-(trimethylsilyl)silanaminato]indium (INCA-1) as the indium precursor, diethlzinc (DEZ) as the zinc precursor, and hydrogen peroxide (H2O2) as the reactant. The ALD process of IZO deposition was carried by repeated supercycles, including one cycle of indium oxide (In2O3) and one cycle of zinc oxide (ZnO). The IZO growth rate deviates from the sum of the respective In2O3 and ZnO growth rates at ALD growth temperatures of 150, 175, and 200 °C. We propose growth temperature-dependent surface reactions during the In2O3 cycle that correspond with the growth-rate results. Thin-film transistors (TFTs) were fabricated with the ALD-grown IZO thin films as the active layer. The amorphous IZO TFTs exhibited high mobility of 42.1 cm(2) V(-1) s(-1) and good positive bias temperature stress stability. Finally, flexible IZO TFT was successfully fabricated on a polyimide substrate without performance degradation, showing the great potential of ALD-grown TFTs for flexible display applications.

  5. Binary metal oxide nanoparticle incorporated composite multilayer thin films for sono-photocatalytic degradation of organic pollutants

    Science.gov (United States)

    Gokul, Paramasivam; Vinoth, Ramalingam; Neppolian, Bernaurdshaw; Anandhakumar, Sundaramurthy

    2017-10-01

    We report reduced graphene oxide (rGO) supported binary metal oxide (CuO-TiO2/rGO) nanoparticle (NP) incorporated multilayer thin films based on Layer-by-Layer (LbL) assembly for enhanced sono-photocatalytic degradation of methyl orange under exposure to UV radiation. Multilayer thin films were fabricated on glass and quartz slides, and investigated using scanning electron microscopy and UV-vis spectroscopy. The loading of catalyst NPs on the film resulted in the change of morphology of the film from smooth to rough with uniformly distributed NPs on the surface. The growth of the control and NP incorporated films followed a linear regime as a function of number of layers. The%degradation of methyl orange as a function of time was investigated by UV-vis spectroscopy and total organic carbon (TOC) measurements. Complete degradation of methyl orange was achieved within 13 h. The amount of NP loading in the film significantly influenced the%degradation of methyl orange. Catalyst reusability studies revealed that the catalyst thin films could be repeatedly used for up to five times without any change in photocatalytic activity of the films. The findings of the present study support that the binary metal oxide catalyst films reported here are very useful for continuous systems, and thus, making it an option for scale up.

  6. Real Time,in situ Observation of the Photocatalytic Destruction of Saccharomyces cerevisiae Cells by Palladium-modified Nitrogen-doped Titanium Oxide Thin Film

    National Research Council Canada - National Science Library

    Jingtao Zhang Qi Li Ronghui Li Jian Ku Shang

    2015-01-01

    Palladium-modified nitrogen-doped titanium oxide(TiON/PdO) thin film was synthesized by the ion-beamassisted deposition technique,which enabled a heavy nitrogen doping and the subsequent light absorption extension...

  7. Atomic force microscopy studies of homoepitaxial GaN layers grown on GaN template by laser MBE

    Science.gov (United States)

    Choudhary, B. S.; Singh, A.; Tanwar, S.; Tyagi, P. K.; Kumar, M. Senthil; Kushvaha, S. S.

    2016-04-01

    We have grown homoepitaxial GaN films on metal organic chemical vapor deposition (MOCVD) grown 3.5 µm thick GaN on sapphire (0001) substrate (GaN template) using an ultra-high vacuum (UHV) laser assisted molecular beam epitaxy (LMBE) system. The GaN films were grown by laser ablating a polycrystalline solid GaN target in the presence of active r.f. nitrogen plasma. The influence of laser repetition rates (10-30 Hz) on the surface morphology of homoepitaxial GaN layers have been studied using atomic force microscopy. It was found that GaN layer grown at 10 Hz shows a smooth surface with uniform grain size compared to the rough surface with irregular shape grains obtained at 30 Hz. The variation of surface roughness of the homoepitaxial GaN layer with and without wet chemical etching has been also studied and it was observed that the roughness of the film decreased after wet etching due to the curved structure/rough surface.

  8. Poole-Frenkel behavior in amorphous oxide thin-film transistors prepared on SiOC

    Energy Technology Data Exchange (ETDEWEB)

    Oh, Teresa [Cheongju University, Cheongju (Korea, Republic of)

    2014-05-15

    The electron behavior in amorphous indium-gallium-zinc-oxide thin film transistors (a-IGZO TFTs) depends on the polar characteristics of SiOC, which is used as a gate dielectric. The properties of the interface between the semiconductor and SiOC were defined by using a Schottky contact with a low potential barrier and Poole-Frenkel contacts with a high potential barrier. The leakage current of SiOC, which was used as a gate insulator, decreased at the Poole-Frenkel contacts because of the high potential barrier. The ambipolar properties in the field effect transistor were observed to depend on the various characteristics of SiOC, which ranged from its behaving as an ideal insulator or as a material with a high dielectric constant. The resistance of the a-IGZO channel changed from positive to negative at SiOC, which had the lowest polarity. As to the conduction due to the diffusion current, the mobility increased with increasing carrier concentrations. However, the drift carrier conduction was related to the reduced mobility at higher carrier concentrations. The performance of the transistors was enhanced by the tunneling and the diffusion currents Rather than by the drift current caused by trapping. The Schottky contact and the Poole-Frenkel (PF) contacts at an interface between the IGZO channel and the SiOC were defined according to the heights of potential barriers caused by the depletion layer. The leakage current was very low about 10{sup -12} A at SiOC with PF contacts because of the height of potential barrier was double that with a Schottky contact because the tunneling conductance due to the diffusion current originated from the PF contacts of non-polar SiOC.

  9. Characteristics of Reduced Graphene Oxide Quantum Dots for a Flexible Memory Thin Film Transistor.

    Science.gov (United States)

    Kim, Yo-Han; Lee, Eun Yeol; Lee, Hyun Ho; Seo, Tae Seok

    2017-05-17

    Reduced graphene oxide quantum dot (rGOQD) devices in formats of capacitor and thin film transistor (TFT) were demonstrated and examined as the first trial to achieve nonambipolar channel property. In addition, through a gold nanoparticle (Au NP) layer embedded between the rGOQD active channel and dielectric layer, memory capacitor and TFT performances were realized by capacitance-voltage (C-V) hysteresis and gate program, erase, and reprogram biases. First, capacitor structure of the rGOQD memory device was constructed to examine memory charging effect featured in hysteretic C-V behavior with a 30 nm dielectric layer of cross-linked poly(vinyl alcohol). For the intervening Au NP charging layer, self-assembled monolayer (SAM) formation of the Au NP was executed to utilize electrostatic interaction by a dip-coating process under ambient environments with a conformal fabrication uniformity. Second, the rGOQD memory TFT device was also constructed in the same format of the Au NPs SAMs on a flexible substrate. Characteristics of the rGOQD TFT output showed novel saturation curves unlike typical graphene-based TFTs. However, The rGOQD TFT device reveals relatively low on/off ratio of 10 1 and mobility of 5.005 cm 2 /V·s. For the memory capacitor, the flat-band voltage shift (ΔV FB ) was measured as 3.74 V for ±10 V sweep, and for the memory TFT, the threshold voltage shift (ΔV th ) by the Au NP charging was detected as 7.84 V. In summary, it was concluded that the rGOQD memory device could accomplish an ideal graphene-based memory performance, which could have provided a wide memory window and saturated output characteristics.

  10. High-performance solution-processed amorphous zinc-indium-tin oxide thin-film transistors.

    Science.gov (United States)

    Kim, Myung-Gil; Kim, Hyun Sung; Ha, Young-Geun; He, Jiaqing; Kanatzidis, Mercouri G; Facchetti, Antonio; Marks, Tobin J

    2010-08-04

    Films of the high-performance solution-processed amorphous oxide semiconductor a-ZnIn(4)Sn(4)O(15), grown from 2-methoxyethanol/ethanolamine solutions, were used to fabricate thin-film transistors (TFTs) in combination with an organic self-assembled nanodielectric as the gate insulator. This structurally dense-packed semiconductor composition with minimal Zn(2+) incorporation strongly suppresses transistor off-currents without significant mobility degradation, and affords field-effect electron mobilities of approximately 90 cm(2) V(-1) s(-1) (104 cm(2) V(-1) s(-1) maximum obtained for patterned ZITO films), with I(on)/I(off) ratio approximately 10(5), a subthreshhold swing of approximately 0.2 V/dec, and operating voltage properties of ZITO semiconductor film compositions in the range Zn(9-2x)In(x)Sn(x)O(9+1.5x) (x = 1-4) and ZnIn(8-x)Sn(x)O(13+0.5x) (x = 1-7) were systematically investigated to elucidate those factors which yield optimum mobility, I(on)/I(off), and threshold voltage parameters. It is shown that structural relaxation and densification by In(3+) and Sn(4+) mixing is effective in reducing carrier trap sites and in creating carrier-generating oxygen vacancies. In contrast to the above results for TFTs fabricated with the organic self-assembled nanodielectric, ZnIn(4)Sn(4)O(15) TFTs fabricated with SiO(2) gate insulators exhibit electron mobilities of only approximately 11 cm(2) V(-1) s(-1) with I(on)/I(off) ratios approximately 10(5), and a subthreshhold swing of approximately 9.5 V/dec.

  11. Indium oxide thin-film transistors processed at low temperature via ultrasonic spray pyrolysis

    KAUST Repository

    Faber, Hendrik

    2015-01-14

    The use of ultrasonic spray pyrolysis is demonstrated for the growth of polycrystalline, highly uniform indium oxide films at temperatures in the range of 200-300 °C in air using an aqueous In(NO3)3 precursor solution. Electrical characterization of as-deposited films by field-effect measurements reveals a strong dependence of the electron mobility on deposition temperature. Transistors fabricated at ∼250 °C exhibit optimum performance with maximum electron mobility values in the range of 15-20 cm2 V -1 s-1 and current on/off ratio in excess of 106. Structural and compositional analysis of as-grown films by means of X-ray diffraction, diffuse scattering, and X-ray photoelectron spectroscopy reveal that layers deposited at 250 °C are denser and contain a reduced amount of hydroxyl groups as compared to films grown at either lower or higher temperatures. Microstructural analysis of semiconducting films deposited at 250 °C by high resolution cross-sectional transmission electron microscopy reveals that as-grown layers are extremely thin (∼7 nm) and composed of laterally large (30-60 nm) highly crystalline In2O3 domains. These unique characteristics of the In2O3 films are believed to be responsible for the high electron mobilities obtained from transistors fabricated at 250 °C. Our work demonstrates the ability to grow high quality low-dimensional In2O3 films and devices via ultrasonic spray pyrolysis over large area substrates while at the same time it provides guidelines for further material and device improvements.

  12. Dynamic Optoelectronic Properties in Perovskite Oxide Thin Films Measured with Ultrafast Transient Absorption & Reflectance Spectroscopy

    Science.gov (United States)

    Smolin, Sergey Y.

    Ultrafast transient absorption and reflectance spectroscopy are foundational techniques for studying photoexcited carrier recombination mechanisms, lifetimes, and charge transfer rates. Because quantifying photoexcited carrier dynamics is central to the intelligent design and improvement of many solid state devices, these transient optical techniques have been applied to a wide range of semiconductors. However, despite their promise, interpretation of transient absorption and reflectance data is not always straightforward and often relies on assumptions of physical processes, especially with respect to the influence of heating. Studying the material space of perovskite oxides, the careful collection, interpretation, and analysis of ultrafast data is presented here as a guide for future research into novel semiconductors. Perovskite oxides are a class of transition metal oxides with the chemical structure ABO3. Although traditionally studied for their diverse physical, electronic, and magnetic properties, perovskite oxides have gained recent research attention as novel candidates for light harvesting applications. Indeed, strong tunable absorption, unique interfacial properties, and vast chemical flexibility make perovskite oxides a promising photoactive material system. However, there is limited research characterizing dynamic optoelectronic properties, such as recombination lifetimes, which are critical to know in the design of any light-harvesting device. In this thesis, ultrafast transient absorption and reflectance spectroscopy was used to understand these dynamic optoelectronic properties in highquality, thin (electronic contributions to spectral transients in LaFeO3. Upon comparison to thermally-derived static spectra of LaFeO3, we find that thermal contributions dominate the transient absorption and reflectance spectra above the band gap. A transient photoinduced absorption feature below the band gap at 1.9 eV is not reproduced in the thermally derived

  13. Influence of oblique-angle sputtered transparent conducting oxides on performance of Si-based thin film solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Leem, Jung Woo; Yu, Jae Su [Department of Electronics and Radio Engineering, Kyung Hee University, 1 Seocheon-dong, Giheung-gu, Yongin-si, Gyeonggi-do 446-701 (Korea, Republic of)

    2011-09-15

    The transparent conducting oxide (TCO) films with low-refractive-index (low-n) are fabricated by the oblique-angle sputtering method. By using the experimentally measured physical data of the fabricated low-n TCO films as the simulation parameters, the effect of low-n TCOs on the performance of a-Si:H/{mu}c-Si:H tandem thin film solar cells is investigated using Silvaco ATLAS. The Al-doped zinc oxide, indium tin oxide (ITO), and Sb-doped tin oxide films are deposited at the flux incidence angles of {theta}{sub i} = 0 (normal sputtering) and {theta}{sub i} = 80 from the sputtering target during the sputtering process. The oblique-angle sputtered films at {theta}{sub i} = 80 show the inclined columnar nanostructures compared to those at {theta}{sub i} = 0 , modifying the optical properties of the films. This is caused mainly by the increase of porosity within the film which leads to its low-n characteristics. The a-Si:H/{mu}c-Si:H tandem thin film solar cell incorporated with the low-n ITO film exhibits an improvement in the conversion efficiency of {proportional_to}1% under AM1.5g illumination because of its higher transmittance and lower absorption compared to that with the ITO film at {theta}{sub i} = 0 , indicating a conversion efficiency of 13.75%. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  14. Electronic Structure of Low-Temperature Solution-Processed Amorphous Metal Oxide Semiconductors for Thin-Film Transistor Applications.

    Science.gov (United States)

    Socratous, Josephine; Banger, Kulbinder K; Vaynzof, Yana; Sadhanala, Aditya; Brown, Adam D; Sepe, Alessandro; Steiner, Ullrich; Sirringhaus, Henning

    2015-03-25

    The electronic structure of low temperature, solution-processed indium-zinc oxide thin-film transistors is complex and remains insufficiently understood. As commonly observed, high device performance with mobility >1 cm(2) V(-1) s(-1) is achievable after annealing in air above typically 250 °C but performance decreases rapidly when annealing temperatures ≤200 °C are used. Here, the electronic structure of low temperature, solution-processed oxide thin films as a function of annealing temperature and environment using a combination of X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and photothermal deflection spectroscopy is investigated. The drop-off in performance at temperatures ≤200 °C to incomplete conversion of metal hydroxide species into the fully coordinated oxide is attributed. The effect of an additional vacuum annealing step, which is beneficial if performed for short times at low temperatures, but leads to catastrophic device failure if performed at too high temperatures or for too long is also investigated. Evidence is found that during vacuum annealing, the workfunction increases and a large concentration of sub-bandgap defect states (re)appears. These results demonstrate that good devices can only be achieved in low temperature, solution-processed oxides if a significant concentration of acceptor states below the conduction band minimum is compensated or passivated by shallow hydrogen and oxygen vacancy-induced donor levels.

  15. The effect of NaCl on room-temperature-processed indium oxide nanoparticle thin films for printed electronics

    Energy Technology Data Exchange (ETDEWEB)

    Häming, M., E-mail: Marc.Haeming@yahoo.de [Karlsruhe Institute of Technology (KIT), Institute for Photon Science and Synchrotron Radiation (IPS), D-76344 Eggenstein-Leopoldshafen (Germany); Baby, T.T. [Karlsruhe Institute of Technology (KIT), Institute of Nanotechnology, 76344 Eggenstein-Leopoldshafen (Germany); Garlapati, S.K. [Karlsruhe Institute of Technology (KIT), Institute of Nanotechnology, 76344 Eggenstein-Leopoldshafen (Germany); Technische Universität Darmstadt, KIT-TUD Joint Research Laboratory for Nanomaterials, Jovanka-Bontschits-Str. 2, 64287 Darmstadt (Germany); Krause, B. [Karlsruhe Institute of Technology (KIT), Institute for Photon Science and Synchrotron Radiation (IPS), D-76344 Eggenstein-Leopoldshafen (Germany); Hahn, H. [Karlsruhe Institute of Technology (KIT), Institute of Nanotechnology, 76344 Eggenstein-Leopoldshafen (Germany); Technische Universität Darmstadt, KIT-TUD Joint Research Laboratory for Nanomaterials, Jovanka-Bontschits-Str. 2, 64287 Darmstadt (Germany); Karlsruhe Institute of Technology (KIT), Helmholtz Institute Ulm, Albert-Einstein-Allee 11, 89081 Ulm (Germany); Dasgupta, S. [Karlsruhe Institute of Technology (KIT), Institute of Nanotechnology, 76344 Eggenstein-Leopoldshafen (Germany); Department of Materials Engineering, Indian Institute of Science, Bangalore 560012 (India); Weinhardt, L.; Heske, C. [Karlsruhe Institute of Technology (KIT), Institute for Photon Science and Synchrotron Radiation (IPS), D-76344 Eggenstein-Leopoldshafen (Germany); Karlsruhe Institute of Technology (KIT), Institute for Chemical Technology and Polymer Chemistry (ITCP), 76128 Karlsruhe (Germany); University of Nevada, Las Vegas (UNLV), Department of Chemistry and Biochemistry, Las Vegas, NV 89154-4003 (United States)

    2017-02-28

    Highlights: • The effect of NaCl ink additive on indium oxide nanoparticle thin films is analyzed. • NaCl changes the thin film morphology and its chemical structure. • NaCl decomposes the nanoparticle shell leading to lower charge transport barriers. • Explanation of the increase in field effect mobility from 1 to >12 cm{sup 2}/Vs. • Understanding of the ink drying process and the nanoparticle agglomeration behavior. - Abstract: One of the major challenges in flexible electronics industry is the fabrication of high-mobility field-effect transistors (FETs) at ambient conditions and on inexpensive polymer substrates compatible with roll-to-roll printing technology. In this context, a novel and general route towards room-temperature fabrication of printed FETs with remarkably high field-effect mobility (μ{sub FET}) above 12 cm{sup 2}/Vs has recently been developed. A detailed understanding of the chemical structure of the involved nanoparticle (NP) thin films, prepared by chemical flocculation, is essential for further optimization of the charge transport properties of such devices. In this study, we thus analyze indium oxide NP thin films with and without NaCl additive using x-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). It is demonstrated that the introduction of a sodium chloride additive to the ink leads to a strongly altered film morphology and a modification of the NP shell. The results suggest that, as a consequence of the additive, the charge-transport barriers between individual indium oxide NPs are lowered, facilitating long-range charge percolation paths despite the presence of a significant concentration of carbonaceous residues.

  16. Formation and reduction of thin oxide films on a stainless steel surface upon subsequent treatments with oxygen and hydrogen plasma

    Energy Technology Data Exchange (ETDEWEB)

    Mozetič, M., E-mail: miran.mozetic@guest.arnes.si [Jozef Stefan Institute, Jamova cesta 39, 1000 Ljubljana (Slovenia); Vesel, A.; Kovač, J.; Zaplotnik, R.; Modic, M. [Jozef Stefan Institute, Jamova cesta 39, 1000 Ljubljana (Slovenia); Balat-Pichelin, M. [PROMES-CNRS Laboratory, 7 Rue du four solaire, 66120 Font Romeu Odeillo (France)

    2015-09-30

    Approximately 500-nm-thick oxide films formed on the surface of AISI 316L stainless steel samples upon brief exposure to oxygen plasma that was created by microwave discharge at approximately 500 W nominal power. During plasma treatment, the samples were simultaneously heated by concentrated solar radiation such that the temperature increased almost linearly to approximately 1100 K, after which the heating was abruptly turned off. After oxidation, the samples were exposed to hydrogen plasma in the same experimental chamber using the same heating regime to reduce the oxide films. The sample temperature was monitored using an infrared pyrometer. The result showed several knees in the signal versus treatment time due to chemical reactions between the oxidised stainless steel and the hydrogen plasma. Scanning electron microscopy, atomic force microscopy and Auger electron spectroscopy depth profiling were used to determine the surface and thin film modifications. The oxidation by oxygen plasma caused the formation of densely packed oxide crystallites rich in Fe and Mn on the surface followed by a rather thick chromium oxide subsurface film. The removal of oxygen from the surface film was indicated by a sudden decrease of the material emissivity that occurred in a few seconds at approximately 1300 K. Subsequent oxidation and reduction cycles caused nanostructuring of the surface morphology because evenly distributed islets of uniform lateral dimension (approximately 100 nm) were observed on the surface after the treatments. - Highlights: • Reduction of oxides from stainless steel surface in H{sub 2} plasma was studied. • The first step is removal of MnO{sub 2} followed by reduction of Cr{sub 2}O{sub 3}. • 0.5 μm thick oxide was removed in only 10 s at temperatures 1200 K–1350 K. • Nanostructuring of the surface was observed upon the oxide reduction.

  17. Wrinkle-free graphene electrodes in zinc tin oxide thin-film transistors for large area applications

    Science.gov (United States)

    Lee, Se-Hee; Kim, Jae-Hee; Park, Byeong-Ju; Park, Jozeph; Kim, Hyun-Suk; Yoon, Soon-Gil

    2017-02-01

    Wrinkle-free graphene was used to form the source-drain electrodes in thin film transistors based on a zinc tin oxide (ZTO) semiconductor. A 10 nm thick titanium adhesion layer was applied prior to transferring a conductive graphene film on top of it by chemical detachment. The formation of an interlayer oxide between titanium and graphene allows the achievement of uniform surface roughness over the entire substrate area. The resulting devices were thermally treated in ambient air, and a substantial decrease in field effect mobility is observed with increasing annealing temperature. The increase in electrical resistivity of the graphene film at higher annealing temperatures may have some influence, however the growth of the oxide interlayer at the ZTO/Ti boundary is suggested to be most influential, thereby inducing relatively high contact resistance.

  18. Silicon Cations Intermixed Indium Zinc Oxide Interface for High-Performance Thin-Film Transistors Using a Solution Process.

    Science.gov (United States)

    Na, Jae Won; Rim, You Seung; Kim, Hee Jun; Lee, Jin Hyeok; Hong, Seonghwan; Kim, Hyun Jae

    2017-09-06

    Solution-processed amorphous metal-oxide thin-film transistors (TFTs) utilizing an intermixed interface between a metal-oxide semiconductor and a dielectric layer are proposed. In-depth physical characterizations are carried out to verify the existence of the intermixed interface that is inevitably formed by interdiffusion of cations originated from a thermal process. In particular, when indium zinc oxide (IZO) semiconductor and silicon dioxide (SiO2) dielectric layer are in contact and thermally processed, a Si(4+) intermixed IZO (Si/IZO) interface is created. On the basis of this concept, a high-performance Si/IZO TFT having both a field-effect mobility exceeding 10 cm(2) V(-1) s(-1) and a on/off current ratio over 10(7) is successfully demonstrated.

  19. Wrinkle-free graphene electrodes in zinc tin oxide thin-film transistors for large area applications.

    Science.gov (United States)

    Lee, Se-Hee; Kim, Jae-Hee; Park, Byeong-Ju; Park, Jozeph; Kim, Hyun-Suk; Yoon, Soon-Gil

    2017-02-17

    Wrinkle-free graphene was used to form the source-drain electrodes in thin film transistors based on a zinc tin oxide (ZTO) semiconductor. A 10 nm thick titanium adhesion layer was applied prior to transferring a conductive graphene film on top of it by chemical detachment. The formation of an interlayer oxide between titanium and graphene allows the achievement of uniform surface roughness over the entire substrate area. The resulting devices were thermally treated in ambient air, and a substantial decrease in field effect mobility is observed with increasing annealing temperature. The increase in electrical resistivity of the graphene film at higher annealing temperatures may have some influence, however the growth of the oxide interlayer at the ZTO/Ti boundary is suggested to be most influential, thereby inducing relatively high contact resistance.

  20. Self-organized pattern formation in the oxidation of supported iron thin films. II. A simulation study

    Science.gov (United States)

    Ogale, Abhijit S.

    2001-07-01

    The process of oxidation of supported iron thin films is modeled by casting it into the form of an activator-inhibitor system, with precursor oxidation state as the activator, and stress produced by the large density difference between the metal and its oxide as a fast-diffusing inhibitor. An activator-substrate mechanism also coexists due to the finite availability of iron. The redistribution of iron by diffusion via vacancies also indirectly contributes to the activation process. A slow process of ripening, which minimizes surface energy, is suggested to convert the early leaflike pattern to a spiral assembly of hillocks. This model simulation yields patterns, which closely resemble the patterns observed in experiments reported by Shinde et al. [Phys. Rev. B 64, 035408 (2001)], in the accompanying Paper I.

  1. Transparent conducting ZnO-CdO mixed oxide thin films grown by the sol-gel method.

    Science.gov (United States)

    Pathak, Trilok K; Rajput, Jeevitesh K; Kumar, Vinod; Purohit, L P; Swart, H C; Kroon, R E

    2017-02-01

    Mixed oxides of zinc and cadmium with different proportions were deposited on ordinary glass substrates using the sol-gel spin coating method under optimized deposition conditions using zinc acetate dihydrate and cadmium acetate dihydrate as precursors. X-ray diffraction patterns confirmed the polycrystalline nature of the films. A combination of cubic CdO and hexagonal wurtzite ZnO phases was observed. The oxidation states of Zn, Cd and O in the deposited films were determined by X-ray photoelectron spectroscopic studies. Surface morphology was studied by scanning electron microscopy and atomic force microscopy. The compositional analysis of the thin films was studied by secondary ion mass spectroscopy. The transmittance of the thin films was measured in the range 300-800nm and the optical bandgap was calculated using Tauc's plot method. The bandgap decreased from 3.15eV to 2.15eV with increasing CdO content. The light emission properties of the ZnO:CdO thin films were studied by photoluminescence spectra recorded at room temperature. The current-voltage characteristics were also assessed and showed ohmic behaviour. The resistance decreased with increasing CdO content. Copyright © 2016 Elsevier Inc. All rights reserved.

  2. Incorporation of surface plasmon resonance with novel valinomycin doped chitosan-graphene oxide thin film for sensing potassium ion.

    Science.gov (United States)

    Zainudin, Afiq Azri; Fen, Yap Wing; Yusof, Nor Azah; Al-Rekabi, Sura Hmoud; Mahdi, Mohd Adzir; Omar, Nur Alia Sheh

    2018-02-15

    In this study, the combination of novel valinomycin doped chitosan-graphene oxide (C-GO-V) thin film and surface plasmon resonance (SPR) system for potassium ion (K+) detection has been developed. The novel C-GO-V thin film was deposited on the gold surface using spin coating technique. The system was used to monitor SPR signal for K+ in solution with and without C-GO-V thin film. The K+ can be detected by measuring the SPR signal when C-GO-V thin film is exposed to K+ in solution. The sensor produces a linear response for K+ ion up to 100ppm with sensitivity and detection limit of 0.00948°ppm-1 and 0.001ppm, respectively. These results indicate that the C-GO-V film is high potential as a sensor element for K+ that has been proved by the SPR measurement. Copyright © 2017 Elsevier B.V. All rights reserved.

  3. Room temperature deposition of zinc oxide thin films by rf-magnetron sputtering for application in solar cells

    Science.gov (United States)

    Sanal, K. C.; Trujillo, R. R.; Nair, P. K.; Nair, M. T. S.

    2016-09-01

    Recent reports indicate that thin films of oxides of zinc: ZnO, Zn(O,S), or Zn-Mg-O, could be a better buffer component than CdS to provide an adequate band alignment with orthorhombic tin sulphide in thin lm solar cells. Thin films of ZnO were grown by rf-magnetron sputtering on different substrates at room temperature. Thin films of ZnO obtained by different deposition methods show hexagonal crystal structure, usually with a preferential orientation of (002) crystallographic planes parallel to the substrate surface. However, in the present study XRD patterns indicate that thicker ZnO films on glass substrates have preferential growth of (103) planes, while that on chemically deposited CdS or ZnS films preferential orientation of (002) planes persists. Bandgap of ZnO films increases from 3.2 eV to 3.4 eV when the chamber pressure used for deposition varies from 2.3 mTorr to 6 mTorr. ZnO films were incorporated in a solar cell structure stainless steel/SnS(cubic)/SnS(orthorhombic)/SnS(cubic)/CdS/ZnO/ZnO:Al. It showed open-circuit voltage of 0.318 V, short-circuit current density of 3.6 mA/cm2 and conversion efficiency of 0.82%.

  4. Oxygen Partial Pressure Impact on Characteristics of Indium Titanium Zinc Oxide Thin Film Transistor Fabricated via RF Sputtering.

    Science.gov (United States)

    Hsu, Ming-Hung; Chang, Sheng-Po; Chang, Shoou-Jinn; Wu, Wei-Ting; Li, Jyun-Yi

    2017-06-26

    Indium titanium zinc oxide (InTiZnO) as the channel layer in thin film transistor (TFT) grown by RF sputtering system is proposed in this work. Optical and electrical properties were investigated. By changing the oxygen flow ratio, we can suppress excess and undesirable oxygen-related defects to some extent, making it possible to fabricate the optimized device. XPS patterns for O 1s of InTiZnO thin films indicated that the amount of oxygen vacancy was apparently declined with the increasing oxygen flow ratio. The fabricated TFTs showed a threshold voltage of -0.9 V, mobility of 0.884 cm²/Vs, on-off ratio of 5.5 × 10⁵, and subthreshold swing of 0.41 V/dec.

  5. Composition and morphological characteristics of chemically sprayed fluorine-doped zinc oxide thin films deposited on Si(1 0 0)

    Energy Technology Data Exchange (ETDEWEB)

    Castaneda, L. [Centro de Ciencias Aplicadas y Desarrollo Tecnologico, Universidad Nacional Autonoma de Mexico, Apartado Postal 70-186, 04510 D. F. (Mexico); Departamento de Fisica y Matematicas, Division de Ciencia, Arte y Tecnologia, Universidad Iberoamericana, Av. Prolongacion Paseo de la Reforma 880, Santa Fe 012100, D. F. (Mexico); Maldonado, A. [Depto. de Ing. Electrica, CINVESTAV IPN, SEES, Apartado Postal 14740, Mexico, D.F. 07000 (Mexico); Cheang-Wong, J.C. [Instituto de Fisica, Universidad Nacional Autonoma de Mexico, Apartado Postal 20-364, Mexico, D.F. 01000 (Mexico); Terrones, M. [Advanced Materials Department, IPICYT, Camino a la Presa San Jose 2055, Col. Lomas, 4a. seccion, San Luis Potosi, 78216 (Mexico); Departamento de Fisica y Matematicas, Division de Ciencia, Arte y Tecnologia, Universidad Iberoamericana, Av. Prolongacion Paseo de la Reforma 880, Santa Fe 012100, D. F. (Mexico); Olvera, M. de la L [Depto. de Ing. Electrica, CINVESTAV IPN, SEES, Apartado Postal 14740, Mexico, D.F. 07000 (Mexico)]. E-mail: molvera@cinvestav.mx

    2007-03-01

    Fluorine-doped zinc oxide thin films (ZnO:F) were deposited on Si(1 0 0) substrates by the chemical spray technique (CST) from an aged-solution. The effect of the substrate temperature on the morphology and composition of the ZnO:F thin films was studied. The films were polycrystalline, with a preferential growth along the ZnO (0 0 2) plane, irrespective of the deposition temperature. The average crystal size within the films was ca. 35 nm and the morphology of the surface was found to be dependent on the substrate temperature. At low substrate temperatures irregular-shaped grains were observed, whereas at higher temperatures uniform flat grains were obtained. Elemental analysis showed that the composition of the films is close to stoichiometric ZnO and that samples contain quite a low fluorine concentration, which decreases as a function of the deposition temperature.

  6. Oxygen Partial Pressure Impact on Characteristics of Indium Titanium Zinc Oxide Thin Film Transistor Fabricated via RF Sputtering

    Directory of Open Access Journals (Sweden)

    Ming-Hung Hsu

    2017-06-01

    Full Text Available Indium titanium zinc oxide (InTiZnO as the channel layer in thin film transistor (TFT grown by RF sputtering system is proposed in this work. Optical and electrical properties were investigated. By changing the oxygen flow ratio, we can suppress excess and undesirable oxygen-related defects to some extent, making it possible to fabricate the optimized device. XPS patterns for O 1s of InTiZnO thin films indicated that the amount of oxygen vacancy was apparently declined with the increasing oxygen flow ratio. The fabricated TFTs showed a threshold voltage of −0.9 V, mobility of 0.884 cm2/Vs, on-off ratio of 5.5 × 105, and subthreshold swing of 0.41 V/dec.

  7. Low-Temperature, Solution-Processed, Transparent Zinc Oxide-Based Thin-Film Transistors for Sensing Various Solvents.

    Science.gov (United States)

    You, Hsin-Chiang; Wang, Cheng-Jyun

    2017-02-26

    A low temperature solution-processed thin-film transistor (TFT) using zinc oxide (ZnO) film as an exposed sensing semiconductor channel was fabricated to detect and identify various solution solvents. The TFT devices would offer applications for low-cost, rapid and highly compatible water-soluble detection and could replace conventional silicon field effect transistors (FETs) as bio-sensors. In this work, we demonstrate the utility of the TFT ZnO channel to sense various liquids, such as polar solvents (ethanol), non-polar solvents (toluene) and deionized (DI) water, which were dropped and adsorbed onto the channel. It is discussed how different dielectric constants of polar/non-polar solvents and DI water were associated with various charge transport properties, demonstrating the main detection mechanisms of the thin-film transistor.

  8. Low-Temperature, Solution-Processed, Transparent Zinc Oxide-Based Thin-Film Transistors for Sensing Various Solvents

    Directory of Open Access Journals (Sweden)

    Hsin-Chiang You

    2017-02-01

    Full Text Available A low temperature solution-processed thin-film transistor (TFT using zinc oxide (ZnO film as an exposed sensing semiconductor channel was fabricated to detect and identify various solution solvents. The TFT devices would offer applications for low-cost, rapid and highly compatible water-soluble detection and could replace conventional silicon field effect transistors (FETs as bio-sensors. In this work, we demonstrate the utility of the TFT ZnO channel to sense various liquids, such as polar solvents (ethanol, non-polar solvents (toluene and deionized (DI water, which were dropped and adsorbed onto the channel. It is discussed how different dielectric constants of polar/non-polar solvents and DI water were associated with various charge transport properties, demonstrating the main detection mechanisms of the thin-film transistor.

  9. Applications of aberration corrected scanning transmission electron microscopy and electron energy loss spectroscopy to thin oxide films and interfaces.

    Energy Technology Data Exchange (ETDEWEB)

    Varela del Arco, Maria [ORNL; Gazquez Alabart, Jaume [ORNL; Lupini, Andrew R [ORNL; Luck, Julia T [ORNL; Torija, Maria [University of Minnesota; Sharma, M [University of Minnesota; Leighton, chris [University of Minnesota; Biegalski, Michael D [ORNL; Christen, Hans M [ORNL; Murfitt, Matt [Nion Co; Dellby, Niklas [ORNL; Krivanek, Ondrej [ORNL; Pennycook, Stephen J [ORNL

    2010-01-01

    Aberration correction in the scanning transmission electron microscope allows spatial resolutions of the order of one ngstr m to be routinely achieved. When combined with electron energy loss spectroscopy, it is possible to simultaneously map the structure, the chemistry and even the electronic properties of materials in one single experiment. Here we will apply these techniques to the characterization of thin films and interfaces based on complex oxides with the perovskite structure. The relatively large lattice parameter of these materials combined with the fact that most of them have absorption edges within the reach of the spectrometer optics makes these materials ideal for these experiments. We will show how it is possible to map the chemistry of interfaces atomic plane by atomic plane, including light element imaging such as O. Applications to cobaltite and titanate thin films will be described.

  10. 30.1 8b thin-film microprocessor using a hybrid oxide-organic complementary technology with inkjet-printed P2ROM memory

    NARCIS (Netherlands)

    Myny, K.; Smout, S.; Rockelé, M.; Bhoolokam, A.; Ke, T.H.; Steudel, S.; Obata, K.; Marinkovic, M.; Pham, D.V.; Hoppe, A.; Gulati, A.; Rodriguez, F.G.; Cobb, B.; Gelinck, G.H.; Genoe, J.; Dehaene, W.; Heremans, P.

    2014-01-01

    We present an 8b general-purpose microprocessor realized in a hybrid oxide-organic complementary thin-film technology. The n-type transistors are based on a solution-processed n-type metal-oxide semiconductor, and the p-type transistors use an organic semiconductor. As compared to previous work

  11. Metallic Tungsten Nanostructures and Highly Nanostructured Thin Films by Deposition of Tungsten Oxide and Subsequent Reduction in a Single Hot-Wire CVD Process

    NARCIS (Netherlands)

    Harks, P.P.R.M.L.; Houweling, Z.S.|info:eu-repo/dai/nl/251874486; de Jong, M.M.|info:eu-repo/dai/nl/325844208; Kuang, Y; Geus, J.W.; Schropp, R.E.I.|info:eu-repo/dai/nl/072502584

    2012-01-01

    The synthesis of metallic tungsten nanostructures and highly nanostructured thin films is presented. Crystalline tungsten oxide nanostructures are deposited on glassy carbon substrates kept at 700 100 8C by oxidizing resistively heated tungsten filaments in an air flow under subatmospheric

  12. Polymer assisted solution processing of Ti-doped indium oxide transparent conducting thin films for organic solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Vishwanath, Sujaya Kumar [Division of Advanced Materials Engineering, Kongju National University, Cheonan, Chungchungnam-do 331-717 (Korea, Republic of); Jin, Won-Yong [The Graduate School of Flexible and Printable Electronics, Polymer BIN Fusion Research Center, Chonbuk National University, Jeonju 561-756 (Korea, Republic of); Kang, Jae-Wook, E-mail: jwkang@jbnu.ac.kr [The Graduate School of Flexible and Printable Electronics, Polymer BIN Fusion Research Center, Chonbuk National University, Jeonju 561-756 (Korea, Republic of); Kim, Jihoon, E-mail: jihoon.kim@kongju.ac.kr [Division of Advanced Materials Engineering, Kongju National University, Cheonan, Chungchungnam-do 331-717 (Korea, Republic of)

    2015-05-15

    Highlights: • Polymer assisted solution process. • Ti-doped indium oxide (TIO) transparent conducting films. • Replacement of sputtered ITO with polymer-assisted-solution-coated TIO films. • High mobility transparent conducting films. • Application of polymer-assisted-solution-coated TIO films to organic solar cells. - Abstract: We report the preparation and evaluation of Ti-doped indium oxide (TIO) transparent conducting films by a polymer-assisted solution (PAS) process, as well as the evaluation of this type of film as a transparent cathode in an inverted organic solar cell (IOCS). Both Ti- and In-PASs have been synthesized by coordinating Ti- and In-anionic complexes with polyethyleneimine. The final TIO–PAS was formed by mixing Ti-PAS into In-PAS with a Ti concentration between 1 at.% and 7 at.%. The TIO–PAS was spin-coated onto glass substrates to form uniform thin films of Ti-doped indium oxide, which were then annealed at high temperature. The optimum Ti concentration to achieve the best electrical and optical properties of PAS–TIO films was found to be 3 at.%. With the film thickness of 650 nm, PAS–TIO films had a sheet resistance of 65 Ω/sq and an optical transmittance greater than 85%. The feasibility of PAS-coated TIO thin film as a transparent electrode was evaluated by applying it to the fabrication of IOSCs, which showed the energy conversion efficiency of 4.60%.

  13. High Electron Mobility Thin-Film Transistors Based on Solution-Processed Semiconducting Metal Oxide Heterojunctions and Quasi-Superlattices

    KAUST Repository

    Lin, Yen-Hung

    2015-05-26

    High mobility thin-film transistor technologies that can be implemented using simple and inexpensive fabrication methods are in great demand because of their applicability in a wide range of emerging optoelectronics. Here, a novel concept of thin-film transistors is reported that exploits the enhanced electron transport properties of low-dimensional polycrystalline heterojunctions and quasi-superlattices (QSLs) consisting of alternating layers of In2O3, Ga2O3, and ZnO grown by sequential spin casting of different precursors in air at low temperatures (180–200 °C). Optimized prototype QSL transistors exhibit band-like transport with electron mobilities approximately a tenfold greater (25–45 cm2 V−1 s−1) than single oxide devices (typically 2–5 cm2 V−1 s−1). Based on temperature-dependent electron transport and capacitance-voltage measurements, it is argued that the enhanced performance arises from the presence of quasi 2D electron gas-like systems formed at the carefully engineered oxide heterointerfaces. The QSL transistor concept proposed here can in principle extend to a range of other oxide material systems and deposition methods (sputtering, atomic layer deposition, spray pyrolysis, roll-to-roll, etc.) and can be seen as an extremely promising technology for application in next-generation large area optoelectronics such as ultrahigh definition optical displays and large-area microelectronics where high performance is a key requirement.

  14. Effects of excimer laser annealing on low-temperature solution based indium-zinc-oxide thin film transistor fabrication

    Directory of Open Access Journals (Sweden)

    Chao-Nan Chen

    2015-04-01

    Full Text Available A Solution Based Indium-Zinc-Oxide thin-film transistor (TFT with a field-effect mobility of 0.58 cm2/Vs, a threshold voltage of 2.84 V by using pulse laser annealing processes. Indium-zinc-oxide (IZO films with a low process temperature were deposited by sol-gel solution based method and KrF excimer laser annealing (wavelength of 248 nm. Solution based indium-zinc-oxide (IZO films usually needs high temperature about 500 °C post annealing in a oven. KrF excimer laser annealing shows advantages of low temperature process, the less process time deceases to only few seconds was used to replace the high temperature process. IZO thin films suffering laser irradiation still keeps the amorphous film quality by transmission electron microscopy (TEM diffraction pattern analysis. It could be expected this technology to large-area flexible display, in the future.

  15. A mixed solution-processed gate dielectric for zinc-tin oxide thin-film transistor and its MIS capacitance.

    Science.gov (United States)

    Kim, Hunho; Kwack, Young-Jin; Yun, Eui-Jung; Choi, Woon-Seop

    2016-09-19

    Solution-processed gate dielectrics were fabricated with the combined ZrO2 and Al2O3 (ZAO) in the form of mixed and stacked types for oxide thin film transistors (TFTs). ZAO thin films prepared with double coatings for solid gate dielectrics were characterized by analytical tools. For the first time, the capacitance of the oxide semiconductor was extracted from the capacitance-voltage properties of the zinc-tin oxide (ZTO) TFTs with the combined ZAO dielectrics by using the proposed metal-insulator-semiconductor (MIS) structure model. The capacitance evolution of the semiconductor from the TFT model structure described well the threshold voltage shift observed in the ZTO TFT with the ZAO (1:2) gate dielectric. The electrical properties of the ZTO TFT with a ZAO (1:2) gate dielectric showed low voltage driving with a field effect mobility of 37.01 cm(2)/Vs, a threshold voltage of 2.00 V, an on-to-off current ratio of 1.46 × 10(5), and a subthreshold slope of 0.10 V/dec.

  16. Water-Mediated Photochemical Treatments for Low-Temperature Passivation of Metal-Oxide Thin-Film Transistors.

    Science.gov (United States)

    Heo, Jae Sang; Jo, Jeong-Wan; Kang, Jingu; Jeong, Chan-Yong; Jeong, Hu Young; Kim, Sung Kyu; Kim, Kwanpyo; Kwon, Hyuck-In; Kim, Jaekyun; Kim, Yong-Hoon; Kim, Myung-Gil; Park, Sung Kyu

    2016-04-27

    The low-temperature electrical passivation of an amorphous oxide semiconductor (AOS) thin-film transistor (TFT) is achieved by a deep ultraviolet (DUV) light irradiation-water treatment-DUV irradiation (DWD) method. The water treatment of the first DUV-annealed amorphous indium-gallium-zinc-oxide (a-IGZO) thin film is likely to induce the preferred adsorption of water molecules at the oxygen vacancies and leads to subsequent hydroxide formation in the bulk a-IGZO films. Although the water treatment initially degraded the electrical performance of the a-IGZO TFTs, the second DUV irradiation on the water-treated devices may enable a more complete metal-oxygen-metal lattice formation while maintaining low oxygen vacancies in the oxide films. Overall, the stable and dense metal-oxygen-metal (M-O-M) network formation could be easily achieved at low temperatures (below 150 °C). The successful passivation of structural imperfections in the a-IGZO TFTs, such as hydroxyl group (OH-) and oxygen vacancies, mainly results in the enhanced electrical performances of the DWD-processed a-IGZO TFTs (on/off current ratio of 8.65 × 10(9), subthreshold slope of 0.16 V/decade, an average mobility of >6.94 cm(2) V(-1) s(-1), and a bias stability of ΔVTH < 2.5 V), which show more than a 30% improvement over the simple DUV-treated a-IGZO TFTs.

  17. Epitaxial growth and properties of zinc oxide thin films on silicon substrates

    Science.gov (United States)

    Guo, Wei

    ZnO is an attractive material for promising applications in short wavelength optoelectronic devices because of its wide band gap and large exciton binding energy at room temperature (RT). This dissertation is devoted to the development of high quality, single-crystalline ZnO-based light-emitting devices on Si substrates, involving thin film synthesis by pulsed laser deposition, structure-property characterization, prototype device fabrication, strain engineering of thick films, and p-type doping with antimony (Sb). ZnO epitaxy with exceptional quality was achieved on (111) Si substrates for the advantages of inexpensive large wafers, mature device technologies, and multifunctional device integration. Epitaxial bixbyite oxides M2O3 (M=Sc, Lu, Gd) were originally employed as the buffer layer between ZnO and Si. The single-crystalline ZnO films has superior structural, electrical, and optical qualities than all previous reports of ZnO on Si, such as narrow o-rocking curves, low dislocation densities, high electron mobilities at RT, and comparable photoluminescence characteristics to those of ZnO single crystal. The epitaxial orientation relationship, intrinsic donors, microstructural defects, and residual strain of the films were investigated. Prototype n-ZnO/ M2O3/p-Si devices were constructed, and ZnO near-band-edge emission was observed in electroluminescence at RT. Strain engineering of thick films by insertion of low-temperature grown ZnO interlayers was performed to improve the cracking critical thickness to ≥2 mum. Reliable ZnO p-type doping using large-size-mismatched Sb dopant was achieved for the films grown on both (0001) Al2O 3 and (100) Si substrates, with a resistivity of 4.2-60 O cm, a Hall mobility of 0.5-7.7 cm2/V s, and a hole concentration of 3.2x1016-2.2x1017 cm-3 . The origin of p-type conductivity was elucidated from conjugated effects of oxygen-rich growth condition, adequate doping concentration, and dislocation-facilitated formation of

  18. Ionic and electronic transport across interfaces in thin electrolyte film, anode supported solid oxide fuel cells

    Science.gov (United States)

    Lim, Hyung-Tae

    In transport studies in oxygen ion conductors, oxygen chemical potential (muO2) has been usually assumed to be equilibrated across gas/solid electrolyte interfaces. However, since the interfaces exhibit different properties from the bulk, they must have their own ionic and electronic properties. In this study, Pt reference electrodes were embedded within the electrolyte (gadolinia-doped ceria; GDC) in an anode-supported solid oxide fuel cell to measure the electrochemical potential of electrons (ϕ) through the bulk electrolyte and its interfaces under fuel cell operating condition. Based on local equilibrium assumption, which leads to relations between electrochemical potentials of charged species and chemical potential of neutral species, the corresponding mu O2 was estimated. When the GDC is protected by a thin layer of a predominantly ionic conductor from reducing atmosphere, the muO2 varied monotonically through the GDC layer, exhibiting a relatively small change across the cathode interface region. By contrast, when the GDC was exposed to hydrogen, it was significantly reduced, resulting in higher electron concentration. The corresponding mu O2 was small through the GDC layer, exhibiting an abrupt change across the cathode interface region. This difference in the muO2 variation depending upon the relative electronic conduction in the electrolyte resulted in a large difference in the cathode overpotential. The direction of ionic/electronic current and the corresponding internal muO2 through the electrolyte can have a profound effect on its stability. If cell imbalance exists in a series-connected fuel cell stack, a "bad" cell characterized by a higher resistance can be operated under a negative voltage. To investigate the SOFC stack failure by simulating abnormal behavior in a single cell test, yttira stabilized zirconia (YSZ) electrolyte cells were tested with an applied DC bias. When operating under a negative voltage, rapid degradation occurred

  19. Highly flexible transparent thin film heaters based on silver nanowires and aluminum zinc oxides

    Energy Technology Data Exchange (ETDEWEB)

    Cheong, Hahn-Gil; Kim, Jin-Hoon; Song, Jun-Hyuk; Jeong, Unyong; Park, Jin-Woo, E-mail: jwpark09@yonsei.ac.kr

    2015-08-31

    In this work, we developed highly flexible transparent film heaters (f-TFHs) composed of Ag nanowire networks (AgNWs) and aluminum zinc oxide (AZO). Uniform AgNWs were roll-to-roll coated on polyethylene terephthalate (PET) substrates using the Mayer rod method, and AZO was sputter-deposited atop the AgNWs at room temperature. The sheet resistance (R{sub s}) and transparency (T{sub opt}) of the AZO-coated AgNWs changed only slightly compared with the uncoated AgNWs. AZO is thermally less conductive than the heat pipes, but increases the thermal efficiency of the heaters blocking the heat convection through the air. Based on Joule heating, a higher average film temperature (T{sub ave}) is attained at a fixed electric potential drop between electrodes (ϕ) as the R{sub s} of the film decreases. Our experimental results revealed that T{sub ave} of the hybrid f-TFH is higher than AgNWs when the ratio of the area coverage of AgNWs to AZO is over a certain value. When a ϕ as low as 3 V/cm was applied to 5 cm × 5 cm f-TFHs, the maximum temperature of the hybrid film was over 100 °C, which is greater than that of AgNWs by more than 30 °C. Furthermore, uniform heating throughout the surfaces is achieved in the hybrid films while heating begins in small areas where densities of the nanowires (NWs) are the highest in the bare network. The non-uniform heating decreases the lifetime of f-TFHs by forming hot spots. Cyclic bending test results indicated that the hybrid films were as flexible as the AgNWs, and the R{sub s} of the hybrid films changes only slightly until 5000 cycles. Combined with the high-throughput coating technology presented here, the hybrid films will provide a robust and scalable strategy for large-area f-TFHs with highly enhanced performance. - Highlights: • We developed highly efficient flexible thin film heaters based on Ag nanowires and AZO composites. • In the composite, AZO plays an important role as an insulation blanket to block heat loss to

  20. Effects of concentration of reduced graphene oxide on properties of sol–gel prepared Al-doped zinc oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Chou, Ching-Tian; Wang, Fang-Hsing, E-mail: fansen@dragon.nchu.edu.tw; Chen, Wei-Chun

    2016-04-30

    Reduced-graphene-oxide-incorporated aluminum-doped zinc oxide (AZO:rGO) composite thin films were synthesized on glass substrates by using the sol–gel method. The effect of the rGO concentration (0–3 wt%) on structural, electrical, and optical properties of the composite film was investigated by X-ray diffraction, scanning electron microscopy, atomic force microscopy, Hall-effect measurement, and ultraviolet–visible spectrometry. All of the composite films showed a typical hexagonal wurtzite structure, and the films incorporated with 1 wt% rGO showed the highest (0 0 2) peak intensity. The sheet resistance of the films was effectively reduced by a factor of more than two as the rGO ratio increased from 0 to 1 wt%. However, the sheet resistance increased with a further increase in the rGO ratio. The optical transmittance of the composite film monotonically decreased with increasing the rGO ratio from 0 to 3 wt%. The average optical transmittance (400–700 nm) of the AZO:rGO thin film within 1 wt% rGO was above 81%. - Highlights: • Reduced-graphene-oxide-doped ZnO:Al composite films are synthesized by sol–gel. • All AZO:rGO thin films show a typical hexagonal wurtzite structure. • Sheet resistance of AZO:rGO(1 wt%) film decreases by a factor of more than two. • The average visible transmittance of the AZO:rGO(1 wt%) film was 81%.

  1. Zinc oxide based nanocomposite thin film electrodes and the effect of D.C. plasma oxidation power on discharge capacity for lithium ion batteries.

    Science.gov (United States)

    Akbulut, Hatem; Guler, Mehmet Oguz; Aydin, Yasemin

    2012-12-01

    Zinc oxide based thin films have been grown on glass and stainless steel substrates in two steps; thermal evaporation from high purity metallic zinc and D.C. plasma oxidation. X-ray diffraction has shown that the films were polycrystalline nature and small predominant orientation at some specific planes. Analysis showed that plasma oxidation starts from the thermally evaporated leaf-like surfaces and produces a core-shell structure of ZnO on the metallic Zn. Increasing plasma oxidation power causes increased amount of ZnO volume and resistivity. Coin-type (CR2016) test cells were assembled in an argon-filled glove box and cyclically tested. The electrochemical performance of the films has been studied by cyclic voltammetry. The dependence of converted Li-ions on voltage profile of the films has been determined. It was found that the Zn/ZnO films exhibited highest the number of converted Li-ions at 175 W plasma oxidation conditions. Discharge capacity measurements revealed the double phase structures of Zn/ZnO exhibited significantly high reversible capacities. The high capacity and low capacity fade values were attributed to the high electrical conductivity and buffering ability of metallic Zn in the anodes.

  2. Scanning and transmission electron microscopy investigation of multiwall carbon nanotube/nickel oxide nanocomposite thin films

    CSIR Research Space (South Africa)

    Roro, Kittessa T

    2011-12-01

    Full Text Available Owing to their unique electronic and optical properties, nanocomposite thin films are widely used for converting solar radiation therapy into other conventional energy forms, such as heat and electricity. Carbon nanotube-based composites which can...

  3. Study of blended conductive graft copolymer with graphite oxide thin films deposited using spin coating method for gas sensing and photovoltaic applications

    Science.gov (United States)

    KałuŻyński, P.; Procek, M.; Stolarczyk, Agnieszka; Maciak, E.

    2017-08-01

    This work presents an investigation on conductive graft comb copolymer like SILPEG CH9 with carbon materials like graphite oxide or reduced graphite oxide. Morphology and optical properties like sample roughness, graphite oxide particles distribution, optical transmittance were measured of obtained thin films deposited on glass substrate using spin coating method. The study showed that obtained thin films are repeatable, convenient to process, and their parameters can be easy changed by the spin rate regulation during the deposition. Given results shows the possibility of using such polymer blend in the implementation of organic photovoltaic cells and different optoelectronics applications.

  4. Atomically Thin Interfacial Suboxide Key to Hydrogen Storage Performance Enhancements of Magnesium Nanoparticles Encapsulated in Reduced Graphene Oxide.

    Science.gov (United States)

    Wan, Liwen F; Liu, Yi-Sheng; Cho, Eun Seon; Forster, Jason D; Jeong, Sohee; Wang, Hsiao-Tsu; Urban, Jeffrey J; Guo, Jinghua; Prendergast, David

    2017-09-13

    As a model system for hydrogen storage, magnesium hydride exhibits high hydrogen storage density, yet its practical usage is hindered by necessarily high temperatures and slow kinetics for hydrogenation-dehydrogenation cycling. Decreasing particle size has been proposed to simultaneously improve the kinetics and decrease the sorption enthalpies. However, the associated increase in surface reactivity due to increased active surface area makes the material more susceptible to surface oxidation or other side reactions, which would hinder the overall hydrogenation-dehydrogenation process and diminish the capacity. Previous work has shown that the chemical stability of Mg nanoparticles can be greatly enhanced by using reduced graphene oxide as a protecting agent. Although no bulklike crystalline MgO layer has been clearly identified in this graphene-encapsulated/Mg nanocomposite, we propose that an atomically thin layer of honeycomb suboxide exists, based on first-principles interpretation of Mg K-edge X-ray absorption spectra. Density functional theory calculations reveal that in contrast to conventional expectations for thick oxides this interfacial oxidation layer permits H2 dissociation to the same degree as pristine Mg metal with the added benefit of enhancing the binding between reduced graphene oxide and the Mg nanoparticle, contributing to improved mechanical and chemical stability of the functioning nanocomposite.

  5. Surface plasmon resonance biochip based on ZnO thin film for nitric oxide sensing.

    Science.gov (United States)

    Feng, Wei-Yi; Chiu, Nan-Fu; Lu, Hui-Hsin; Shih, Hsueh-Ching; Yang, Dongfang; Lin, Chii-Wann

    2008-01-01

    In this study, the design of a novel optical sensor that comprises surface plasmon resonance sensing chip and zinc oxide nano-film was proposed for the detection of nitric oxide gas. The electrical and optical properties of zinc oxide film vary in the presence of nitric oxide. This effect was utilized to prepare biochemical sensors with transduction based on surface plasmon resonance. Due to the refractive index of the transparent zinc oxide film that was deposited on the gold film, however, changes will be observed in the surface plasmon resonance spectra. For this reason, the thickness of zinc oxide film will be investigated and determined in this study. The interaction of nitric oxide with a 20 nm zinc oxide layer on gold leads to the shift of the resonance angle. The analysis on the reflectance intensity of light demonstrates that such effect is caused by the variation of conductivity and permittivity of zinc oxide film. Finally, a shift in surface plasmon resonance angle was measured in 25 ppm nitric oxide at 180 C and a calibration curve of nitride oxide concentration versus response intensity was successfully obtained in the range of 250 to 1000 ppm nitric oxide at lower temperature of 150 C. Moreover, these effects are quasi-reversible.

  6. Polyvinylpyrrolidone/reduced graphene oxide nanocomposites thin films coated on quartz crystal microbalance for NO2 detection at room temperature

    Science.gov (United States)

    Huang, Junlong; Xie, Guangzhong; Zhou, Yong; Xie, Tao; Tai, HuiLing; Yang, Guangjin

    2014-08-01

    Polyvinylpyrrolidone (PVP)/reduced graphene oxide (RGO) nanocomposites are sprayed on quartz crystal microbalance (QCM) for NO2 sensing. The thin films are characterized by Fourier transform infrared spectroscopy (FTIR) and ultraviolet-visible spectroscopy (UV-VIS). The experimental results reveal that PVP/RGO sensor exhibits higher sensitivity and shorter recovery time than those of PVP. Besides, the response to 20 ppm NO2 is higher than other gases such as CO, CO2 and NH3 even at 100ppm. When the PVP/RGO sensor is exposed to these gases, the good selectivity to NO2 makes the sensor ideal for NO2 detection.

  7. Nanoscale conductive pattern of the homoepitaxial AlGaN/GaN transistor

    Science.gov (United States)

    Pérez-Tomás, A.; Catalàn, G.; Fontserè, A.; Iglesias, V.; Chen, H.; Gammon, P. M.; Jennings, M. R.; Thomas, M.; Fisher, C. A.; Sharma, Y. K.; Placidi, M.; Chmielowska, M.; Chenot, S.; Porti, M.; Nafría, M.; Cordier, Y.

    2015-03-01

    The gallium nitride (GaN)-based buffer/barrier mode of growth and morphology, the transistor electrical response (25-310 °C) and the nanoscale pattern of a homoepitaxial AlGaN/GaN high electron mobility transistor (HEMT) have been investigated at the micro and nanoscale. The low channel sheet resistance and the enhanced heat dissipation allow a highly conductive HEMT transistor (Ids > 1 A mm-1) to be defined (0.5 A mm-1 at 300 °C). The vertical breakdown voltage has been determined to be ˜850 V with the vertical drain-bulk (or gate-bulk) current following the hopping mechanism, with an activation energy of 350 meV. The conductive atomic force microscopy nanoscale current pattern does not unequivocally follow the molecular beam epitaxy AlGaN/GaN morphology but it suggests that the FS-GaN substrate presents a series of preferential conductive spots (conductive patches). Both the estimated patches density and the apparent random distribution appear to correlate with the edge-pit dislocations observed via cathodoluminescence. The sub-surface edge-pit dislocations originating in the FS-GaN substrate result in barrier height inhomogeneity within the HEMT Schottky gate producing a subthreshold current.

  8. Electro-thermal control of aluminum-doped zinc oxide/vanadium dioxide multilayered thin films for smart-device applications.

    Science.gov (United States)

    Skuza, J R; Scott, D W; Mundle, R M; Pradhan, A K

    2016-02-17

    We demonstrate the electro-thermal control of aluminum-doped zinc oxide (Al:ZnO) /vanadium dioxide (VO2) multilayered thin films, where the application of a small electric field enables precise control of the applied heat to the VO2 thin film to induce its semiconductor-metal transition (SMT). The transparent conducting oxide nature of the top Al:ZnO film can be tuned to facilitate the fine control of the SMT of the VO2 thin film and its associated properties. In addition, the Al:ZnO film provides a capping layer to the VO2 thin film, which inhibits oxidation to a more energetically favorable and stable V2O5 phase. It also decreases the SMT of the VO2 thin film by approximately 5-10 °C because of an additional stress induced on the VO2 thin film and/or an alteration of the oxygen vacancy concentration in the VO2 thin film. These results have significant impacts on technological applications for both passive and active devices by exploiting this near-room-temperature SMT.

  9. Morphology, structural and optical properties of iron oxide thin film photoanodes in photoelectrochemical cell: Effect of electrochemical oxidation

    OpenAIRE

    Maabong Kelebogile; Machatine Augusto G.; Hu Yelin; Braun Artur; Nambala Fred J.; Diale Mmantsae

    2016-01-01

    Abstract Hematite (a Fe2O3) is a promising semiconductor as photoanode in solar hydrogen production from photoelectrolysis of water due to its appropriate band gap low cost and high electrochemical stability in aqueous caustic electrolytes. Operation of such photoanode in a biased photoelectrochemical cell constitutes an anodization with consequent redox reactions at the electrode surface. a Fe2O3 thin film photoanodes were prepared by simple and inexpensive dip coating method on fluorine dop...

  10. Electrochemical preparation of few layer-graphene nanosheets via reduction of oriented exfoliated graphene oxide thin films in acetamide-urea-ammonium nitrate melt under ambient conditions

    Energy Technology Data Exchange (ETDEWEB)

    Dilimon, V.S.; Sampath, S., E-mail: sampath2562@gmail.co

    2011-01-31

    Electrochemical reduction of exfoliated graphene oxide, prepared from pre-exfoliated graphite, in acetamide-urea-ammonium nitrate ternary eutectic melt results in few layer-graphene thin films. Negatively charged exfoliated graphene oxide is attached to positively charged cystamine monolyer self-assembled on a gold surface. Electrochemical reduction of the oriented graphene oxide film is carried out in a room temperature, ternary molten electrolyte. The reduced film is characterized by atomic force microscopy (AFM), conductive AFM, Fourier-transform infrared spectroscopy and Raman spectroscopy. Ternary eutectic melt is found to be a suitable medium for the regulated reduction of graphene oxide to reduced graphene oxide-based sheets on conducting surfaces.

  11. High-density carrier-accumulated and electrically stable oxide thin-film transistors from ion-gel gate dielectric

    Science.gov (United States)

    Fujii, Mami N.; Ishikawa, Yasuaki; Miwa, Kazumoto; Okada, Hiromi; Uraoka, Yukiharu; Ono, Shimpei

    2015-12-01

    The use of indium-gallium-zinc oxide (IGZO) has paved the way for high-resolution uniform displays or integrated circuits with transparent and flexible devices. However, achieving highly reliable devices that use IGZO for low-temperature processes remains a technological challenge. We propose the use of IGZO thin-film transistors (TFTs) with an ionic-liquid gate dielectric in order to achieve high-density carrier-accumulated IGZO TFTs with high reliability, and we discuss a distinctive mechanism for the degradation of this organic-inorganic hybrid device under long-term electrical stress. Our results demonstrated that an ionic liquid or gel gate dielectric provides highly reliable and low-voltage operation with IGZO TFTs. Furthermore, high-density carrier accumulation helps improve the TFT characteristics and reliability, and it is highly relevant to the electronic phase control of oxide materials and the degradation mechanism for organic-inorganic hybrid devices.

  12. Plasma Deposited Thin Iron Oxide Films as Electrocatalyst for Oxygen Reduction Reaction in Proton Exchange Membrane Fuel Cells

    Directory of Open Access Journals (Sweden)

    Lukasz JOZWIAK

    2017-02-01

    Full Text Available The possibility of using plasma deposited thin films of iron oxides as electrocatalyst for oxygen reduction reaction (ORR in proton exchange membrane fuel cells (PEMFC was examined. Results of energy-dispersive X-ray spectroscopy (EDX and X-ray photoelectron spectroscopy (XPS analysis indicated that the plasma deposit consisted mainly of FeOX structures with the X parameter close to 1.5. For as deposited material iron atoms are almost exclusively in the Fe3+ oxidation state without annealing in oxygen containing atmosphere. However, the annealing procedure can be used to remove the remains of carbon deposit from surface. The single cell test (SCT was performed to determine the suitability of the produced material for ORR. Preliminary results showed that power density of 0.23 mW/cm2 could be reached in the tested cell.DOI: http://dx.doi.org/10.5755/j01.ms.23.1.14406

  13. Effects of air annealing on the optical, electrical, and structural properties of indium-tin oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Trejo-Cruz, C. [Cinvestav-Queretaro, Libramiento Norponiente 2000, Fracc. Real de Juriquilla, 76230 Queretaro (Mexico); Mendoza-Galvan, A., E-mail: amendoza@qro.cinvestav.m [Cinvestav-Queretaro, Libramiento Norponiente 2000, Fracc. Real de Juriquilla, 76230 Queretaro (Mexico); Lopez-Beltran, A.M. [Cinvestav-Queretaro, Libramiento Norponiente 2000, Fracc. Real de Juriquilla, 76230 Queretaro (Mexico); Facultad de Ciencias Quimico-Biologicas, Universidad Autonoma de Sinaloa, Ciudad Universitaria, 80010 Culiacan (Mexico); Gracia-Jimenez, M. [Instituto de Fisica, Benemerita Universidad Autonoma de Puebla, Av. San Claudio y 18 Sur, 72570 Puebla (Mexico)

    2009-06-30

    The effects of air annealing on the optical, electrical, and structural properties of indium-tin oxide thin films were investigated using spectroscopic ellipsometry in the UV-visible range, reflectance-transmittance spectra at normal incidence in the infrared range, electrical resistivity measurements, and X-ray diffraction. It was found that annealing at 300 {sup o}C produces an overall shift to lower photon energies of the optical constant spectra, which is related to the increase in electrical resistivity. The electrical measurements performed in the 25-300 K range show a metallic behavior with large residual resistivity, quantity that increases with annealing temperature and is closely related with the change in the relative intensity of the main diffraction peaks. Also it is shown that under certain conditions of film deposition onto indium-tin oxide, some of its properties can change in a similar way as in air-annealing processing.

  14. Growth kinetics of thin oxide layers; oxidation of Fe and Fe-N phases at room temperature

    NARCIS (Netherlands)

    Kooi, Bart J.; Somers, Marcel A.J.; Mittemeijer, Eric J.

    1996-01-01

    The evolution of iron-oxide layers at room temperature on pure polycrystalline α-Fe and on the Fe-N phases γ-Fe[N], γ'-Fe4N1-x and ε-Fe2N1-z was followed in situ with Auger-Electron Spectroscopy. The observed oxidation kinetics of the Fe and Fe-N phases were interpreted using a model considering

  15. Critical issues for homoepitaxial GaN growth by molecular beam epitaxy on hydride vapor-phase epitaxy-grown GaN substrates

    Science.gov (United States)

    Storm, D. F.; Hardy, M. T.; Katzer, D. S.; Nepal, N.; Downey, B. P.; Meyer, D. J.; McConkie, Thomas O.; Zhou, Lin; Smith, David J.

    2016-12-01

    While the heteroepitaxial growth of gallium nitride-based materials and devices on substrates such as SiC, sapphire, and Si has been well-documented, the lack of a cost-effective source of bulk GaN crystals has hindered similar progress on homoepitaxy. Nevertheless, freestanding GaN wafers are becoming more widely available, and there is great interest in growing GaN films and devices on bulk GaN substrates, in order to take advantage of the greatly reduced density of threading dislocations, particularly for vertical devices. However, homoepitaxial GaN growth is far from a trivial task due to the reactivity and different chemical sensitivities of N-polar (0001) and Ga-polar (0001) GaN surfaces, which can affect the microstructure and concentrations of impurities in homoepitaxial GaN layers. In order to achieve high quality, high purity homoepitaxial GaN, it is necessary to investigate the effect of the ex situ wet chemical clean, the use of in situ cleaning procedures, the sensitivity of the GaN surface to thermal decomposition, and the effect of growth temperature. We review the current understanding of these issues with a focus on homoepitaxial growth of GaN by molecular beam epitaxy (MBE) on c-plane surfaces of freestanding GaN substrates grown by hydride vapor phase epitaxy (HVPE), as HVPE-grown substrates are most widely available. We demonstrate methods for obtaining homoepitaxial GaN layers by plasma-assisted MBE in which no additional threading dislocations are generated from the regrowth interface and impurity concentrations are greatly reduced.

  16. The Microstructures and Electrical Resistivity of (Al, Cr, TiFeCoNiOx High-Entropy Alloy Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    Chun-Huei Tsau

    2015-01-01

    Full Text Available The (Al, Cr, TiFeCoNi alloy thin films were deposited by PVD and using the equimolar targets with same compositions from the concept of high-entropy alloys. The thin films became metal oxide films after annealing at vacuum furnace for a period; and the resistivity of these thin films decreased sharply. After optimum annealing treatment, the lowest resistivity of the FeCoNiOx, CrFeCoNiOx, AlFeCoNiOx, and TiFeCoNiOx films was 22, 42, 18, and 35 μΩ-cm, respectively. This value is close to that of most of the metallic alloys. This phenomenon was caused by delaminating of the alloy oxide thin films because the oxidation was from the surfaces of the thin films. The low resistivity of these oxide films was contributed to the nonfully oxidized elements in the bottom layers and also vanishing of the defects during annealing.

  17. Amorphous and Crystalline Vanadium Oxides as High-Energy and High-Power Cathodes for Three-Dimensional Thin-Film Lithium Ion Batteries.

    Science.gov (United States)

    Mattelaer, Felix; Geryl, Kobe; Rampelberg, Geert; Dendooven, Jolien; Detavernier, Christophe

    2017-04-19

    Flexible wearable electronics and on-chip energy storage for wireless sensors drive rechargeable batteries toward thin-film lithium ion batteries. To enable more charge storage on a given surface, higher energy density materials are required, while faster energy storage and release can be obtained by going to thinner films. Vanadium oxides have been examined as cathodes in classical and thin-film lithium ion batteries for decades, but amorphous vanadium oxide thin films have been mostly discarded. Here, we investigate the use of atomic layer deposition, which enables electrode deposition on complex three-dimensional (3D) battery architectures, to obtain both amorphous and crystalline VO2 and V2O5, and we evaluate their thin-film cathode performance. Very high volumetric capacities are found, alongside excellent kinetics and good cycling stability. Better kinetics and higher volumetric capacities were observed for the amorphous vanadium oxides compared to their crystalline counterparts. The conformal deposition of these vanadium oxides on silicon micropillar structures is demonstrated. This study shows the promising potential of these atomic layer deposited vanadium oxides as cathodes for 3D all-solid-state thin-film lithium ion batteries.

  18. Reduction of a thin chromium oxide film on Inconel surface upon treatment with hydrogen plasma

    Energy Technology Data Exchange (ETDEWEB)

    Vesel, Alenka, E-mail: alenka.vesel@guest.arnes.si [Jozef Stefan Institute, Jamova cesta 39, 1000 Ljubljana (Slovenia); Mozetic, Miran [Jozef Stefan Institute, Jamova cesta 39, 1000 Ljubljana (Slovenia); Balat-Pichelin, Marianne [PROMES-CNRS Laboratory, 7 Rue du four solaire, 66120 Font Romeu Odeillo (France)

    2016-11-30

    Highlights: • Oxidized Inconel alloy was exposed to hydrogen at temperatures up to 1500 K. • Oxide reduction in hydrogen plasma started at approximately 1300 K. • AES depth profiling revealed complete reduction of oxides in plasma. • Oxides were not reduced, if the sample was heated just in hydrogen atmosphere. • Surface of reduced Inconel preserved the same composition as the bulk material. - Abstract: Inconel samples with a surface oxide film composed of solely chromium oxide with a thickness of approximately 700 nm were exposed to low-pressure hydrogen plasma at elevated temperatures to determine the suitable parameters for reduction of the oxide film. The hydrogen pressure during treatment was set to 60 Pa. Plasma was created by a surfaguide microwave discharge in a quartz glass tube to allow for a high dissociation fraction of hydrogen molecules. Auger electron depth profiling (AES) was used to determine the decay of the oxygen in the surface film and X-ray diffraction (XRD) to measure structural modifications. During hydrogen plasma treatment, the oxidized Inconel samples were heated to elevated temperatures. The reduction of the oxide film started at temperatures of approximately 1300 K (considering the emissivity of 0.85) and the oxide was reduced in about 10 s of treatment as revealed by AES. The XRD showed sharper substrate peaks after the reduction. Samples treated in hydrogen atmosphere under the same conditions have not been reduced up to approximately 1500 K indicating usefulness of plasma treatment.

  19. X-ray Spectroscopy of Ultra-thin Oxide/oxide Heteroepitaxial Films: A Case Study of Single-nanometer VO2/TiO2

    Energy Technology Data Exchange (ETDEWEB)

    Quackenbush, Nicholas F. [Binghamton Univ., NY (United States); Paik, Hanjong [Cornell Univ., Ithaca, NY (United States); Woicik, Joseph C. [National Inst. of Standards and Technology (NIST), Gaithersburg, MD (United States); Arena, Dario A. [Brookhaven National Lab. (BNL), Upton, NY (United States); Schlom, Darrell G. [Cornell Univ. and Kavli Inst. at Cornell for Nanoscale Science, Ithaca, NY (United States); Piper, Louis F. J. [Binghamton Univ., NY (United States)

    2015-08-21

    Epitaxial ultra-thin oxide films can support large percent level strains well beyond their bulk counterparts, thereby enabling strain-engineering in oxides that can tailor various phenomena. At these reduced dimensions (typically < 10 nm), contributions from the substrate can dwarf the signal from the epilayer, making it difficult to distinguish the properties of the epilayer from the bulk. This is especially true for oxide on oxide systems. Here, we have employed a combination of hard X-ray photoelectron spectroscopy (HAXPES) and angular soft X-ray absorption spectroscopy (XAS) to study epitaxial VO2/TiO2 (100) films ranging from 7.5 to 1 nm. We observe a low-temperature (300 K) insulating phase with evidence of vanadium-vanadium (V-V) dimers and a high-temperature (400 K) metallic phase absent of V-V dimers irrespective of film thickness. Results confirm that the metal insulator transition can exist at atomic dimensions and that biaxial strain can still be used to control the temperature of its transition when the interfaces are atomically sharp. Generally, our case study highlights the benefits of using non-destructive XAS and HAXPES to extract out information regarding the interfacial quality of the epilayers and spectroscopic signatures associated with exotic phenomena at these dimensions.

  20. The Influence of Doping with Transition Metal Ions on the Structure and Magnetic Properties of Zinc Oxide Thin Films

    Directory of Open Access Journals (Sweden)

    Jenica Neamtu

    2014-01-01

    Full Text Available Zn1−xNixO (x=0.03÷0.10 and Zn1−xFexO (x=0.03÷0.15 thin films were synthesized by sol-gel method. The structure and the surface morphology of zinc oxide thin films doped with transition metal (TM ions have been investigated by X-ray diffraction (XRD and atomic force microscopy (AFM. The magnetic studies were done using vibrating sample magnetometer (VSM at room temperature. Experimental results revealed that the substitution of Ni ions in ZnO wurtzite lattice for the contents x=0.03÷0.10 (Ni2+ leads to weak ferromagnetism of thin films. For Zn1-xFexO with x=0.03÷0.05, the Fe3+ ions are magnetic coupling by superexchange interaction via oxygen ions in wurtzite structure. For x=0.10÷0.15 (Fe3+ one can observe the increasing of secondary phase of ZnFe2O4 spinel. The Zn0.9Fe0.1O film shows a superparamagnetic behavior due to small crystallite sizes and the net spin magnetic moments arisen from the interaction between the iron ions through an oxygen ion in the spinel structure.

  1. Influence of oxygen flow rate on metal-insulator transition of vanadium oxide thin films grown by RF magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Ma, Xu; Liu, Xinkun; Li, Haizhu; Huang, Mingju [Henan University, Key Lab of Informational Opto-Electronical Materials and Apparatus, School of Physics and Electronics, Kaifeng (China); Zhang, Angran [South China Normal University, Institute of Electronic Paper Displays, South China Academy of Advanced Optoelectronics, Guangzhou (China)

    2017-03-15

    High-quality vanadium oxide (VO{sub 2}) films have been fabricated on Si (111) substrates by radio frequency (RF) magnetron sputtering deposition method. The sheet resistance of VO{sub 2} has a significant change (close to 5 orders of magnitude) in the process of the metal-insulator phase transition (MIT). The field emission-scanning electron microscope (FE-SEM) results show the grain size of VO{sub 2} thin films is larger with the increase of oxygen flow. The X-ray diffraction (XRD) results indicate the thin films fabricated at different oxygen flow rates grow along the (011) crystalline orientation. As the oxygen flow rate increases from 3 sccm to 6 sccm, the phase transition temperature of the films reduces from 341 to 320 K, the width of the thermal hysteresis loop decreases from 32 to 9 K. The thin films fabricated in the condition of 5 sccm have a high temperature coefficient of resistance (TCR) -3.455%/K with a small resistivity of 2.795 ρ/Ω cm. (orig.)

  2. Metal-organic chemical vapour deposition of lithium manganese oxide thin films via single solid source precursor

    Directory of Open Access Journals (Sweden)

    Oyedotun K.O.

    2015-12-01

    Full Text Available Lithium manganese oxide thin films were deposited on sodalime glass substrates by metal organic chemical vapour deposition (MOCVD technique. The films were prepared by pyrolysis of lithium manganese acetylacetonate precursor at a temperature of 420 °C with a flow rate of 2.5 dm3/min for two-hour deposition period. Rutherford backscattering spectroscopy (RBS, UV-Vis spectrophotometry, X-ray diffraction (XRD spectroscopy, atomic force microscopy (AFM and van der Pauw four point probe method were used for characterizations of the film samples. RBS studies of the films revealed fair thickness of 1112.311 (1015 atoms/cm2 and effective stoichiometric relationship of Li0.47Mn0.27O0.26. The films exhibited relatively high transmission (50 % T in the visible and NIR range, with the bandgap energy of 2.55 eV. Broad and diffused X-ray diffraction patterns obtained showed that the film was amorphous in nature, while microstructural studies indicated dense and uniformly distributed layer across the substrate. Resistivity value of 4.9 Ω·cm was obtained for the thin film. Compared with Mn0.2O0.8 thin film, a significant lattice absorption edge shift was observed in the Li0.47Mn0.27O0.26 film.

  3. Influence of potential, deposition time and annealing temperature on photoelectrochemical properties of electrodeposited iron oxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Tamboli, Sikandar H. [Clean Energy Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul 130-650 (Korea, Republic of); Rahman, Gul [Clean Energy Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul 130-650 (Korea, Republic of); School of Science, University of Science and Technology, 52 Eoeun dong, Yuseong-gu, Daejeon 305-333 (Korea, Republic of); Joo, Oh-Shim, E-mail: joocat61@gmail.com [Clean Energy Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul 130-650 (Korea, Republic of)

    2012-04-15

    Graphical abstract: Morphological transition from nanosheets to elongated dumbbell shaped nanoparticles. Highlights: Black-Right-Pointing-Pointer {alpha}-Fe{sub 2}O{sub 3} thin films were prepared using electrodeposition technique. Black-Right-Pointing-Pointer Effects of various aspects on film's photoelectrochemical properties via film's morphology modification. Black-Right-Pointing-Pointer Morphology changes from nanosheets to nanoparticles due to high annealing temperature. - Abstract: Nanostructured iron oxide thin films have been prepared by electrodeposition technique and annealed at various temperatures. The effect of deposition potential, deposition time and annealing temperature on photoelectrochemical (PEC) properties of {alpha}-Fe{sub 2}O{sub 3} thin films was studied. The (1 0 4) and (1 1 0) peak presence in X-ray diffraction patterns confirms {alpha}-Fe{sub 2}O{sub 3} phase formation. The transition on surface morphology from nanosheets to elongated dumbbell shaped nanoparticles occurred that can be attributed to annealing temperature varied from 400 to 700 Degree-Sign C. Optical band gap variation was observed due to annealing temperature. It was found that increment in film thickness increases the photocurrent from 253 {mu}A/cm{sup 2} to 488 {mu}A/cm{sup 2} at 0.4 V vs Ag/AgCl.

  4. Influence of substrate heating and annealing on the properties and photoresponse of manganese doped zinc oxide thin films

    Science.gov (United States)

    Sugumar, Ravishankar; Angappane, S.

    2017-10-01

    The structural and optical properties of manganese doped zinc oxide thin films deposited at different substrate temperatures and annealing conditions have been studied. Further, the UV light sensing properties of the fabricated thin film devices have been carried out. The 3% Mn doped ZnO (MZO) films were deposited by RF magnetron sputtering. The as-prepared film, deposited without substrate heating, shows the polycrystalline nature with under-developed grains, which develops well-defined crystal boundaries after annealing. On the other hand, the films deposited at 700 °C and annealed at 700 °C show single crystalline c-axis orientated growth. Notably, there are changes observed in the band gap and photoluminescence of the films subject to different deposition and annealing conditions. The photoresponse of the MZO thin film devices shows responsivity varying from 2.5 × 10-2 to 7.9 A/W, detectivity from 1.6 × 1010 to 37.8 × 1010 Jones and sensitivity from 4.7 to 15.4% under the UV light. Markedly, the films show the response times varying from ∼0.1 to ∼28 s and the recovery times varying between ∼0.1 and ∼120 s. These findings demonstrate the influence of structural and optical properties brought out by the substrate heating and annealing of 3% Mn doped ZnO films on the photoresponse of devices.

  5. Fast light-induced reversible wettability of a zinc oxide nanorod array coated with a thin gold layer

    Science.gov (United States)

    Wei, Yuefan; Du, Hejun; Kong, Junhua; Tran, Van-Thai; Koh, Jia Kai; Zhao, Chenyang; He, Chaobin

    2017-11-01

    Zinc oxide (ZnO) has gained much attention recently due to its excellent physical and chemical properties, and has been extensively studied in energy harvesting applications such as photovoltaic and piezoelectric devices. In recent years, its reversible wettability has also attracted increasing interest. The wettability of ZnO nanostructures with various morphologies has been studied. However, to the best of our knowledge, there is still a lack of investigations on further modifications on ZnO to provide more benefits than pristine ZnO. Comprehensive studies on the reversible wettability are still needed. In this study, a ZnO nanorod array was prepared via a hydrothermal process and subsequently coated with thin gold layers with varied thickness. The morphologies and structures, optical properties and wettability were investigated. It is revealed that the ZnO-Au system possesses recoverable wettability upon switching between visible-ultraviolet light and a dark environment, which is verified by the contact angle change. The introduction of the thin gold layer to the ZnO nanorod array effectively increases the recovery rate of the wettability. The improvements are attributed to the hierarchical structures, which are formed by depositing thin gold layers onto the ZnO nanorod array, the visible light sensitivity due to the plasmonic effect of the deposited gold, as well as the fast charge-induced surface status change upon light illumination or dark storage. The improvement is beneficial to applications in environmental purification, energy harvesting, micro-lenses, and smart devices.

  6. Bio-sorbable, liquid electrolyte gated thin-film transistor based on a solution-processed zinc oxide layer.

    Science.gov (United States)

    Singh, Mandeep; Palazzo, Gerardo; Romanazzi, Giuseppe; Suranna, Gian Paolo; Ditaranto, Nicoletta; Di Franco, Cinzia; Santacroce, Maria Vittoria; Mulla, Mohammad Yusuf; Magliulo, Maria; Manoli, Kyriaki; Torsi, Luisa

    2014-01-01

    Among the metal oxide semiconductors, ZnO has been widely investigated as a channel material in thin-film transistors (TFTs) due to its excellent electrical properties, optical transparency and simple fabrication via solution-processed techniques. Herein, we report a solution-processable ZnO-based thin-film transistor gated through a liquid electrolyte with an ionic strength comparable to that of a physiological fluid. The surface morphology and chemical composition of the ZnO films upon exposure to water and phosphate-buffered saline (PBS) are discussed in terms of the operation stability and electrical performance of the ZnO TFT devices. The improved device characteristics upon exposure to PBS are associated with the enhancement of the oxygen vacancies in the ZnO lattice due to Na(+) doping. Moreover, the dissolution kinetics of the ZnO thin film in a liquid electrolyte opens the possible applicability of these devices as an active element in "transient" implantable systems.

  7. The influence of doping with transition metal ions on the structure and magnetic properties of zinc oxide thin films.

    Science.gov (United States)

    Neamtu, Jenica; Volmer, Marius

    2014-01-01

    Zn1-x Ni x O (x = 0.03 ÷ 0.10) and Zn1-x Fe x O (x = 0.03 ÷ 0.15) thin films were synthesized by sol-gel method. The structure and the surface morphology of zinc oxide thin films doped with transition metal (TM) ions have been investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). The magnetic studies were done using vibrating sample magnetometer (VSM) at room temperature. Experimental results revealed that the substitution of Ni ions in ZnO wurtzite lattice for the contents x = 0.03 ÷ 0.10 (Ni(2+)) leads to weak ferromagnetism of thin films. For Zn1-x Fe x O with x = 0.03 ÷ 0.05, the Fe(3+) ions are magnetic coupling by superexchange interaction via oxygen ions in wurtzite structure. For x = 0.10 ÷ 0.15 (Fe(3+)) one can observe the increasing of secondary phase of ZnFe2O4 spinel. The Zn0.9Fe0.1O film shows a superparamagnetic behavior due to small crystallite sizes and the net spin magnetic moments arisen from the interaction between the iron ions through an oxygen ion in the spinel structure.

  8. Preparation of Mn-containing mixed-oxide thin films by a dip-coating method using metal naphthenates

    Energy Technology Data Exchange (ETDEWEB)

    Kaneko, S.; Sugiyama, S.; Mazuka, N. (Shizuoka Univ., Shizuoka (Japan). Faculty of Engineering); Murakami, K. (Shizuoka Univ., Shizuoka (Japan). Research Inst. of Electronics); Yamada, T. (Nissei Electric Co. Ltd., Shizuoka (Japan))

    1994-07-01

    Mn-Co-Ni-O thin films with a metal atomic ratio of 3:2:1, which is expected to result in a negative temperature coefficient of resistance, have been prepared by means of dip coating in a toluene solution containing the corresponding metal naphthenates. The metal naphthenates decomposed thermally to become mixed oxides upon heat treatment at 450[degree]C. A Mn-Co-Ni-O thin film of an appropriate composition for use as a thermistor has been prepared from the mixed metal naphthenates by further heating at temperatures above 700[degree]C. The as-prepared thin film almost completely crystallized to form a complex spinel phase, a solid solution of MnCo2O4 and NiMn2O4, by further heat treatment at temperatures above 700[degree]C for 1h. The sheet resistance of the film was markedly lowered after heat treatment at temperatures above 600[degree]C. The temperature dependence of resistance of the film heat-treated at 700[degree]C was nonlinear. The thermal characteristics of the resistance show that the film is a promising material for use as a thermistor. 13 refs., 5 figs.

  9. Amorphous indium gallium zinc oxide thin film grown by pulse laser deposition technique

    Energy Technology Data Exchange (ETDEWEB)

    Mistry, Bhaumik V., E-mail: bhaumik-phy@yahoo.co.in; Joshi, U. S. [Department of Physics, University School of Sciences, Gujarat University, Ahmedabad-380 009 (India)

    2016-05-23

    Highly electrically conducting and transparent in visible light IGZO thin film were grown on glass substrate at substrate temperature of 400 C by a pulse laser deposition techniques. Structural, surface, electrical, and optical properties of IGZO thin films were investigated at room temperature. Smooth surface morphology and amorphous nature of the film has been confirmed from the AFM and GIXRD analysis. A resistivity down to 7.7×10{sup −3} V cm was reproducibly obtained while maintaining optical transmission exceeding 70% at wavelengths from 340 to 780 nm. The carrier densities of the film was obtain to the value 1.9×10{sup 18} cm{sup 3}, while the Hall mobility of the IGZO thin film was 16 cm{sup 2} V{sup −1}S{sup −1}.

  10. Effect of Deposition Time on the Photoelectrochemical Properties of Cupric Oxide Thin Films Synthesized via Electrodeposition Method

    Directory of Open Access Journals (Sweden)

    Yaw Chong Siang

    2016-01-01

    Full Text Available The main aim of this study was to investigate the effect of deposition time on the physicochemical and photoelectrochemical properties of cupric oxide (CuO thin films synthesized via electrodeposition method. Firstly, the electrodeposition of amorphous CuO films on fluorine-doped tin oxide (FTO working electrodes with varying deposition time between 5 and 30 min was carried out, followed by annealing treatment at 500 °C. Resultant nanocrystalline CuO thin films were characterised using field emission-scanning electron microscopy (FE-SEM, photocurrent density, and photoluminescence measurements. Through FE-SEM analysis, it was observed that the surface of thin films was composed of irregular-sized CuO nanocrystals. A smaller CuO nanocrystals size will lead to a higher photoactivity due to the increase in overall catalytic surface area. In addition, the smaller CuO nanocrystals size will prolongs the electron-hole recombination rate due to the increase in copious amount of surface defects. From this study, it was revealed that the relationship between deposition time and CuO film thickness was non-linear. This could be due to the detachment of CuO thin films from the FTO surface at an increasing amount of CuO mass being deposited. It was observed that the amount of light absorbed by CuO thin films increased with film thickness until a certain extent whereby, any further increase in the film thickness will result in a reduction of light photon penetration. Therefore, the CuO nanocrystals size and film thickness have to be compromised in order to yield a higher catalytic surface area and a lower rate of surface charge recombination. Finally, it was found that the deposition time of 15 min resulted in an average CuO nanocrystals size of 73.7 nm, optimum film thickness of 0.73 μm, and corresponding photocurrent density of 0.23 mA/cm2 at the potential bias of - 0.3 V (versus Ag/AgCl. The PL spectra for the deposition time of 15 min has the lowest

  11. Effect of nickel doping on physical properties of zinc oxide thin films prepared by the spray pyrolysis method

    Energy Technology Data Exchange (ETDEWEB)

    Jlassi, M., E-mail: mohamedjlassilpv@yahoo.fr [Laboratoire de Photovoltaïque, Centre de Recherche et des Technologies de l’Energie, Technopole de Borj-Cédria, BP 95, 2050 Hammam-Lif (Tunisia); Sta, I. [Laboratoire de Photovoltaïque, Centre de Recherche et des Technologies de l’Energie, Technopole de Borj-Cédria, BP 95, 2050 Hammam-Lif (Tunisia); Hajji, M. [Laboratoire de Photovoltaïque, Centre de Recherche et des Technologies de l’Energie, Technopole de Borj-Cédria, BP 95, 2050 Hammam-Lif (Tunisia); Ecole Nationale d’Electronique et des Télécommunications de Sfax, Université de Sfax, BP 1163, CP 3021 Sfax (Tunisia); Ezzaouia, H. [Laboratoire de Photovoltaïque, Centre de Recherche et des Technologies de l’Energie, Technopole de Borj-Cédria, BP 95, 2050 Hammam-Lif (Tunisia)

    2014-05-01

    Highlights: • ZnO and ZnO:Ni thin films are prepared by spray pyrolysis technique. • We have studied the effects of the pulverization time on the physical properties. • We optimize the most suitable duration of pulverization of ZnO thin films. • Amelioration on optical and electrical properties of ZnO:Ni films was noticed. - Abstract: In this study, undoped and nickel-doped zinc oxide thin films (ZnO:Ni) were deposited on glass substrates using a spray pyrolysis technique. The effects of the Zn concentration in the initial solution and the substrate temperature on the physical properties of the thin films are studied. The results show that the optimum Zn concentration and substrate temperature for preparation of basic undoped ZnO films with n-type conductivity and high optical transparency are 0.02 M and 350 °C, respectively. Then, by using these optimized deposition parameters, nickel-doped zinc oxide films are prepared. Surface morphology and crystalline structure of the films are investigated by atomic force microscopy (AFM) and X-ray diffractometer. X-ray diffraction (XRD) patterns show that the films are polycrystalline. The structural analysis shows that all the samples have a hexagonal structure. The crystallite size and the preferred orientation were calculated from the XRD data. From AFM investigations, the surface morphology of the nanostructured films is found to depend on the concentration of Ni. Optical measurements have shown that an increase in the Ni doping results in a reduction in the optical transmission of the layer, but it remains higher than 80% for Ni doping greater than 8 wt%. At the same time, the optical gap increases from 3.4 to 4 eV when the Ni ratio increases. The electrical measurements show that the resistance of the films varies with the duration of pulverization and the nickel content of the film. Low values for the electrical resistivity (around 10{sup 3} Ω cm) were obtained for Ni-doped ZnO thin films.

  12. Gadolinium-doped zinc oxide thin films prepared on different substrates by sol-gel spin-coating

    Science.gov (United States)

    Fadzilah, A. R. Nurul; Othman, R. N.; Miskon, A.; Sahdan, M. Z.; Tawil, S. N. M.

    2017-12-01

    Gadolinium (Gd) doped zinc oxide (ZnO) thin films were prepared by sol-gel spin-coating technique. The solution was prepared using zinc acetate dihydrate and monoethanolamine (MEA) as a stabilizer. The Gd-doped ZnO thin films were deposited on different substrates; glass, aluminium doped ZnO (AZO), fluorine doped tin oxide (FTO) and silicon (Si). The structural and optical properties of Gd-doped ZnO on different substrates were studied using X-ray Diffraction (XRD), Field-Emission Scanning Electron Microscope-Energy Dispersive X-ray (FESEM-EDX) and Ultra Violet-Visible spectrophotometer (UV-Vis), respectively. Based on the XRD data, the crystallite size of the films was found to be in the range of 12.26 ˜ 22.95 nm, which shows a hexagonal wurtzite structure. Transmittance spectra of films deposited on AZO indicates a clear sinusoidal behavior as compared to samples prepared on glass and FTO. All samples exhibit magnetic properties at room temperature measured by means of Vibrating Sample Magnetometer (VSM).

  13. High-performance a-IGZO thin-film transistor with conductive indium-tin-oxide buried layer

    Science.gov (United States)

    Ahn, Min-Ju; Cho, Won-Ju

    2017-10-01

    In this study, we fabricated top-contact top-gate (TCTG) structure of amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors (TFTs) with a thin buried conductive indium-tin oxide (ITO) layer. The electrical performance of a-IGZO TFTs was improved by inserting an ITO buried layer under the IGZO channel. Also, the effect of the buried layer's length on the electrical characteristics of a-IGZO TFTs was investigated. The electrical performance of the transistors improved with increasing the buried layer's length: a large on/off current ratio of 1.1×107, a high field-effect mobility of 35.6 cm2/Vs, a small subthreshold slope of 116.1 mV/dec, and a low interface trap density of 4.2×1011 cm-2eV-1 were obtained. The buried layer a-IGZO TFTs exhibited enhanced transistor performance and excellent stability against the gate bias stress.

  14. Tunable transport property of oxygen ion in metal oxide thin film: Impact of electrolyte orientation on conductivity.

    Science.gov (United States)

    Arunkumar, P; Ramaseshan, R; Dash, S; Babu, K Suresh

    2017-06-14

    Quest for efficient ion conducting electrolyte thin film operating at intermediate temperature (~600 °C) holds promise for the real-world utilization of solid oxide fuel cells. Here, we report the correlation between mixed as well as preferentially oriented samarium doped cerium oxide electrolyte films fabricated by varying the substrate temperatures (100, 300 and 500 °C) over anode/ quartz by electron beam physical vapor deposition. Pole figure analysis of films deposited at 300 °C demonstrated a preferential (111) orientation in out-off plane direction, while a mixed orientation was observed at 100 and 500 °C. As per extended structural zone model, the growth mechanism of film differs with surface mobility of adatom. Preferential orientation resulted in higher ionic conductivity than the films with mixed orientation, demonstrating the role of growth on electrochemical properties. The superior ionic conductivity upon preferential orientation arises from the effective reduction of anisotropic nature and grain boundary density in highly oriented thin films in out-of-plane direction, which facilitates the hopping of oxygen ion at a lower activation energy. This unique feature of growing an oriented electrolyte over the anode material opens a new approach to solving the grain boundary limitation and makes it as a promising solution for efficient power generation.

  15. Functionalization of indium-tin-oxide electrodes by laser-nanostructured gold thin films for biosensing applications

    Energy Technology Data Exchange (ETDEWEB)

    Grochowska, Katarzyna, E-mail: kgrochowska@imp.gda.pl [Centre for Plasma and Laser Engineering, The Szewalski Institute, Polish Academy of Sciences, 14 Fiszera St, 80-231 Gdańsk (Poland); Siuzdak, Katarzyna [Centre for Plasma and Laser Engineering, The Szewalski Institute, Polish Academy of Sciences, 14 Fiszera St, 80-231 Gdańsk (Poland); Karczewski, Jakub [Solid State Physics Department, Faculty of Applied Physics and Mathematics, Gdańsk University of Technology, 11/12 Narutowicza St, 80-233, Gdańsk (Poland); Śliwiński, Gerard [Centre for Plasma and Laser Engineering, The Szewalski Institute, Polish Academy of Sciences, 14 Fiszera St, 80-231 Gdańsk (Poland)

    2015-12-01

    Graphical abstract: - Highlights: • ITO electrodes modified by NP arrays prepared by laser dewetting of thin Au films. • Enhanced activity, linear response and high sensitivity towards glucose. • Promising biosensor material AuNP-modified ITO of improved performance. - Abstract: The production and properties of the indium-tin-oxide (ITO) electrodes functionalized by Au nanoparticle (NP) arrays of a relatively large area formed by pulsed laser nanostructuring of thin gold films are reported and discussed. The SEM inspection of modified electrodes reveals the presence of the nearly spherical and disc-shaped particles of dimensions in the range of 40–120 nm. The NP-array geometry can be controlled by selection of the laser processing conditions. It is shown that particle size and packing density of the array are important factors which determine the electrode performance. In the case of NP-modified electrodes the peak current corresponding to the glucose direct oxidation process shows rise with increasing glucose concentration markedly higher comparing to the reference Au disc electrode. The detection limit reaches 12 μM and linear response of the sensor is observed from 0.1 to 47 mM that covers the normal physiological range of the blood sugar detection.

  16. Development and characterization of fluorine tin oxide electrodes modified with high area porous thin films containing gold nanoparticles

    Energy Technology Data Exchange (ETDEWEB)

    Quintana, Carmen, E-mail: carmen.quintana@uam.e [Dpto. Quimica Analitica y Analisis Instrumental. Facultad de Ciencias. Universidad Autonoma de Madrid. Cantoblanco. 28049-Madrid (Spain); Atienzar, Pedro; Budroni, Gerolamo [Instituto de Tecnologia Quimica de Valencia, UPV-CSIC, Universidad Politecnica de Valencia, Av. de los Naranjos s/n, 46022-Valencia (Spain); Mora, Laura; Hernandez, Lucas [Dpto. Quimica Analitica y Analisis Instrumental. Facultad de Ciencias. Universidad Autonoma de Madrid. Cantoblanco. 28049-Madrid (Spain); Garcia, Hermenegildo; Corma, Avelino [Instituto de Tecnologia Quimica de Valencia, UPV-CSIC, Universidad Politecnica de Valencia, Av. de los Naranjos s/n, 46022-Valencia (Spain)

    2010-10-29

    Different electrode materials are prepared using fluoride doped tin oxide (FTO) electrodes modified with high area porous thin films of metal oxides containing gold nanoparticles. Three different metal oxides (TiO{sub 2}, MgO and SnO{sub 2}) have been assayed to this end. The effect of the metal oxide nature and gold loading on the structure and performance of the modified electrodes was examined by Scanning Electron Microscopy, Transmission Electron Microscopy, X-Ray Diffraction (XRD), Diffuse Reflectance Spectroscopy and electrochemical techniques. XRD measurements reveal that MgO electrodes present the smallest gold nanoparticles after the sintering step however, the electrochemical response of these electrodes shows important problems of mass transport derived from the high porosity of these materials (Brunauer Emmett Teller area of 125 m{sup 2}/g). The excellent sintering properties of titania nanoparticles result in robust films attached to the FTO electrodes which allow more reliable and reproducible results from an electroanalytical point of view.

  17. Review of recent progresses on flexible oxide semiconductor thin film transistors based on atomic layer deposition processes

    Science.gov (United States)

    Sheng, Jiazhen; Han, Ki-Lim; Hong, TaeHyun; Choi, Wan-Ho; Park, Jin-Seong

    2018-01-01

    The current article is a review of recent progress and major trends in the field of flexible oxide thin film transistors (TFTs), fabricating with atomic layer deposition (ALD) processes. The ALD process offers accurate controlling of film thickness and composition as well as ability of achieving excellent uniformity over large areas at relatively low temperatures. First, an introduction is provided on what is the definition of ALD, the difference among other vacuum deposition techniques, and the brief key factors of ALD on flexible devices. Second, considering functional layers in flexible oxide TFT, the ALD process on polymer substrates may improve device performances such as mobility and stability, adopting as buffer layers over the polymer substrate, gate insulators, and active layers. Third, this review consists of the evaluation methods of flexible oxide TFTs under various mechanical stress conditions. The bending radius and repetition cycles are mostly considering for conventional flexible devices. It summarizes how the device has been degraded/changed under various stress types (directions). The last part of this review suggests a potential of each ALD film, including the releasing stress, the optimization of TFT structure, and the enhancement of device performance. Thus, the functional ALD layers in flexible oxide TFTs offer great possibilities regarding anti-mechanical stress films, along with flexible display and information storage application fields. Project supported by the National Research Foundation of Korea (NRF) (No. NRF-2017R1D1A1B03034035), the Ministry of Trade, Industry & Energy (No. #10051403), and the Korea Semiconductor Research Consortium.

  18. Facile encapsulation of oxide based thin film transistors by atomic layer deposition based on ozone.

    Science.gov (United States)

    Fakhri, Morteza; Babin, Nikolai; Behrendt, Andreas; Jakob, Timo; Görrn, Patrick; Riedl, Thomas

    2013-05-28

    A simplified encapsulation strategy for metal-oxide based TFTs, using ozone instead of water as an oxygen source in a low-temperature ALD process is demonstrated. Thereby, the threshold voltage remains unaltered and the hysteresis is permanently reduced. Costly energy- and time-consuming post-treatment processes can be avoided. This concept is widely applicable to various encapsulation materials (e.g., Al2 O3 , TiO2 , ZrO2 ) and metal-oxide channel semiconductors (e.g., zinc-tin-oxide (ZTO), indium-gallium-zinc-oxide (IGZO)). Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  19. Synthesis and Characterization of Graphene Thin Films by Chemical Reduction of Exfoliated and Intercalated Graphite Oxide

    Directory of Open Access Journals (Sweden)

    F. T. Thema

    2013-01-01

    Full Text Available Commercial flakes of graphite were prepared into functionalized graphene oxide (GO by chemical treatment. After the exfoliation and intercalation of graphene into functionalized graphene oxide that formed stable colloidal dispersion in polar aprotic solvent, the reduction process was undertaken by continuous stirring with hydrazine hydrate. The reduced material was characterized by X-ray diffraction (XRD, attenuated total reflectance (ATR FT-IR, ultraviolet visible (UV-vis, atomic force microscopy (AFM and Raman spectroscopy which confirm the oxidation of graphite and reduction of graphene oxide into graphene sheet.

  20. ZnO Nanoparticles/Reduced Graphene Oxide Bilayer Thin Films for Improved NH3-Sensing Performances at Room Temperature

    Science.gov (United States)

    Tai, Huiling; Yuan, Zhen; Zheng, Weijian; Ye, Zongbiao; Liu, Chunhua; Du, Xiaosong

    2016-03-01

    ZnO nanoparticles and graphene oxide (GO) thin film were deposited on gold interdigital electrodes (IDEs) in sequence via simple spraying process, which was further restored to ZnO/reduced graphene oxide (rGO) bilayer thin film by the thermal reduction treatment and employed for ammonia (NH3) detection at room temperature. rGO was identified by UV-vis absorption spectra and X-ray photoelectron spectroscope (XPS) analyses, and the adhesion between ZnO nanoparticles and rGO nanosheets might also be formed. The NH3-sensing performances of pure rGO film and ZnO/rGO bilayer films with different sprayed GO amounts were compared. The results showed that ZnO/rGO film sensors exhibited enhanced response properties, and the optimal GO amount of 1.5 ml was achieved. Furthermore, the optimal ZnO/rGO film sensor showed an excellent reversibility and fast response/recovery rate within the detection range of 10-50 ppm. Meanwhile, the sensor also displayed good repeatability and selectivity to NH3. However, the interference of water molecules on the prepared sensor is non-ignorable; some techniques should be researched to eliminate the effect of moisture in the further work. The remarkably enhanced NH3-sensing characteristics were speculated to be attributed to both the supporting role of ZnO nanoparticles film and accumulation heterojunction at the interface between ZnO and rGO. Thus, the proposed ZnO/rGO bilayer thin film sensor might give a promise for high-performance NH3-sensing applications.