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Sample records for hfn films deposited

  1. Biomimetic thin film deposition

    Science.gov (United States)

    Rieke, P. C.; Campbell, A. A.; Tarasevich, B. J.; Fryxell, G. E.; Bentjen, S. B.

    1991-04-01

    Surfaces derivatized with organic functional groups were used to promote the deposition of thin films of inorganic minerals. These derivatized surfaces were designed to mimic the nucleation proteins that control mineral deposition during formation of bone, shell, and other hard tissues in living organisms. By the use of derivatized substrates control was obtained over the phase of mineral deposited, the orientation of the crystal lattice and the location of deposition. These features are of considerable importance in many technically important thin films, coatings, and composite materials. Methods of derivatizing surfaces are considered and examples of controlled mineral deposition are presented.

  2. Biomimetic thin film deposition

    Energy Technology Data Exchange (ETDEWEB)

    Rieke, P.R.; Graff, G.E.; Campbell, A.A.; Bunker, B.C.; Baskaran, S.; Song, L.; Tarasevich, B.J.; Fryxell, G.E.

    1995-09-01

    Biological mineral deposition for the formation of bone, mollusk shell and other hard tissues provides materials scientists with illustrative materials processing strategies. This presentation will review the key features of biomineralization and how these features can be of technical importance. We have adapted existing knowledge of biomineralization to develop a unique method of depositing inorganic thin films and coating. Our approach to thin film deposition is to modify substrate surfaces to imitate the proteins found in nature that are responsible for controlling mineral deposition. These biomimetic surfaces control the nucleation and growth of the mineral from a supersaturated aqueous solution. This has many processing advantages including simple processing equipment, environmentally benign reagents, uniform coating of highly complex shapes, and enhanced adherence of coating. Many different types of metal oxide, hydroxide, sulfide and phosphate materials with useful mechanical, optical, electronic and biomedical properties can be deposited.

  3. Thin Film Deposition Techniques (PVD)

    Science.gov (United States)

    Steinbeiss, E.

    The most interesting materials for spin electronic devices are thin films of magnetic transition metals and magnetic perovskites, mainly the doped La-manganites [1] as well as several oxides and metals for passivating and contacting the magnetic films. The most suitable methods for the preparation of such films are the physical vapor deposition methods (PVD). Therefore this report will be restricted to these deposition methods.

  4. Variable temperature semiconductor film deposition

    Science.gov (United States)

    Li, Xiaonan; Sheldon, Peter

    1998-01-01

    A method of depositing a semiconductor material on a substrate. The method sequentially comprises (a) providing the semiconductor material in a depositable state such as a vapor for deposition on the substrate; (b) depositing the semiconductor material on the substrate while heating the substrate to a first temperature sufficient to cause the semiconductor material to form a first film layer having a first grain size; (c) continually depositing the semiconductor material on the substrate while cooling the substrate to a second temperature sufficient to cause the semiconductor material to form a second film layer deposited on the first film layer and having a second grain size smaller than the first grain size; and (d) raising the substrate temperature, while either continuing or not continuing to deposit semiconductor material to form a third film layer, to thereby anneal the film layers into a single layer having favorable efficiency characteristics in photovoltaic applications. A preferred semiconductor material is cadmium telluride deposited on a glass/tin oxide substrate already having thereon a film layer of cadmium sulfide.

  5. films using atomic layer deposition

    Science.gov (United States)

    Chervinskii, Semen; Matikainen, Antti; Dergachev, Alexey; Lipovskii, Andrey A.; Honkanen, Seppo

    2014-08-01

    We fabricated self-assembled silver nanoisland films using a recently developed technique based on out-diffusion of silver from an ion-exchanged glass substrate in reducing atmosphere. We demonstrate that the position of the surface plasmon resonance of the films depends on the conditions of the film growth. The resonance can be gradually shifted up to 100 nm towards longer wavelengths by using atomic layer deposition of titania, from 3 to 100 nm in thickness, upon the film. Examination of the nanoisland films in surface-enhanced Raman spectrometry showed that, in spite of a drop of the surface-enhanced Raman spectroscopy (SERS) signal after the titania spacer deposition, the Raman signal can be observed with spacers up to 7 nm in thickness. Denser nanoisland films show slower decay of the SERS signal with the increase in spacer thickness.

  6. Nanofriction properties of molecular deposition films

    Institute of Scientific and Technical Information of China (English)

    王强斌; 高芒来; 张嗣伟

    2000-01-01

    The nanofriction properties of Au substrate and monolayer molecular deposition film and multilayer molecular deposition films on Au substrate and the molecular deposition films modified with alkyl-terminal molecule have been investigated by using an atomic force microscope. It is concluded that ( i ) the deposition of molecular deposition films on Au substrate and the modification of alkyl-terminal molecule to the molecular deposition films can reduce the frictional force; (ii) the molecular deposition films with the same terminal exhibit similar nanofriction properties, which has nothing to do with the molecular chain-length and the layer number; (iii) the unstable nanofriction properties of molecular deposition films are contributed to the active terminal of the molecular deposition film, which can be eliminated by decorating the active molecular deposition film with alkyl-terminal molecule, moreover, the decoration of alkyl-terminal molecule can lower the frictional force conspicuously; (iv) the relat

  7. Pulsed laser deposition: Prospects for commercial deposition of epitaxial films

    Energy Technology Data Exchange (ETDEWEB)

    Muenchausen, R.E.

    1999-03-01

    Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique for the deposition of thin films. The vapor source is induced by the flash evaporation that occurs when a laser pulse of sufficient intensity (about 100 MW/cm{sup 2}) is absorbed by a target. In this paper the author briefly defines pulsed laser deposition, current applications, research directed at gaining a better understanding of the pulsed laser deposition process, and suggests some future directions to enable commercial applications.

  8. Energetic deposition of thin metal films

    CERN Document Server

    Al-Busaidy, M S K

    2001-01-01

    deposited films. The primary aim of this thesis was to study the physical effect of energetic deposition metal thin films. The secondary aim is to enhance the quality of the films produced to a desired quality. Grazing incidence X-ray reflectivity (GIXR) measurements from a high-energy synchrotron radiation source were carried out to study and characterise the samples. Optical Profilers Interferometery, Atomic Force Microscope (AFM), Auger electron spectroscopy (AES), Medium energy ion spectroscopy (MEIS), and the Electron microscope studies were the other main structural characterisation tools used. AI/Fe trilayers, as well as multilayers were deposited using a Nordico planar D.C. magnetron deposition system at different voltage biases and pressures. The films were calibrated and investigated. The relation between energetic deposition variation and structural properties was intensely researched. Energetic deposition refers to the method in which the deposited species possess higher kinetic energy and impact ...

  9. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIU Erjia; ZENG A,LIU L X

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion bombardment on the surface of growing film is one of the major parameters that control the atom mobility on the film surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering power density, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfuric acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  10. Thin Film & Deposition Systems (Windows)

    Data.gov (United States)

    Federal Laboratory Consortium — Coating Lab: Contains chambers for growing thin film window coatings. Plasma Applications Coating Lab: Contains chambers for growing thin film window coatings. Solar...

  11. Thin Film & Deposition Systems (Windows)

    Data.gov (United States)

    Federal Laboratory Consortium — Coating Lab: Contains chambers for growing thin film window coatings. Plasma Applications Coating Lab: Contains chambers for growing thin film window coatings. Solar...

  12. Electrochemical Behaviour of Sputtering Deposited DLC Films

    Institute of Scientific and Technical Information of China (English)

    LIUErjia; ZENGA; LIULX

    2003-01-01

    Diamondlike carbon (DLC) films were deposited via magnetron sputtering process. The energetic ion hombardment on the surface of growing film is one of the major parameters that control the atom mobility on the flirt1 surface and further the physical and chemical characteristics of the films. In this study, the energy of carbon ions was monitored by changing sputtering powerdensity, and its effect on the electrochemical performance of the films was investigated. For the deposition at a higher sputtering power density, a higher sp3 content in the DLC films was achieved with denser structure and increased film-substrate adhesion. The impedance at the interface of Si substrate/sulfufic acid solution was significantly enhanced, and at the same time higher film resistance, lower capacitance, higher breakdown potential and longer breakdown time were observed, which were related to the significant sp3 content of the DLC films.

  13. Liquid phase deposition of electrochromic thin films

    Energy Technology Data Exchange (ETDEWEB)

    Richardson, Thomas J.; Rubin, Michael D.

    2000-08-18

    Thin films of titanium, zirconium and nickel oxides were deposited on conductive SnO2:F glass substrates by immersion in aqueous solutions. The films are transparent, conformal, of uniform thickness and appearance, and adhere strongly to the substrates. On electrochemical cycling, TiO2, mixed TiO2-ZrO2, and NiOx films exhibited stable electrochromism with high coloration efficiencies. These nickel oxide films were particularly stable compared with films prepared by other non-vacuum techniques. The method is simple, inexpensive, energy efficient, and readily scalable to larger substrates.

  14. Perovskite Thin Films via Atomic Layer Deposition

    KAUST Repository

    Sutherland, Brandon R.

    2014-10-30

    © 2014 Wiley-VCH Verlag GmbH & Co. KGaA. (Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.

  15. Perovskite thin films via atomic layer deposition.

    Science.gov (United States)

    Sutherland, Brandon R; Hoogland, Sjoerd; Adachi, Michael M; Kanjanaboos, Pongsakorn; Wong, Chris T O; McDowell, Jeffrey J; Xu, Jixian; Voznyy, Oleksandr; Ning, Zhijun; Houtepen, Arjan J; Sargent, Edward H

    2015-01-01

    A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3 NH3 PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm(-1) .

  16. Hard Carbon Films Deposited under Various Atmospheres

    Science.gov (United States)

    Wei, M.-K.; Chen, S.-C.; Wu, T. C.; Lee, Sanboh

    1998-03-01

    Using a carbon target ablated with an XeCl-excimer laser under various gas atmospheres at different pressures, hard carbon was deposited on silicon, iron and tungsten carbide substrates. The hardness, friction coefficient, and wear rate of the film against steel are better than pure substrate material, respectively, so that it has potential to be used as a protective coating for micromechanical elements. The influences of gas pressure, gas atmosphere, and power density of laser irradiation on the thermal stability of film were analyzed by means of Raman-spectroscope, time-of-flight method, and optical emission spectrum. It was found that the film deposited under higher pressure has less diamond-like character. The film deposited under rest gas or argon atmosphere was very unstable and looked like a little graphite-like character. The film deposited at high vacuum (10-5 mbar rest gas) was the most stable and looked like the most diamond-like character. The film deposited at higher power density was more diamond-like than that at lower power density.

  17. Pulsed laser deposition of tantalum pentoxide film

    Science.gov (United States)

    Zhang, J.-Y.; Boyd, I. W.

    We report thin tantalum pentoxide (Ta2O5) films grown on quartz and silicon substrates by the pulsed laser deposition (PLD) technique employing a Nd:YAG laser (wavelength λ=532 nm) in various O2 gas environments. The effect of oxygen pressure, substrate temperature, and annealing under UV irradiation using a 172-nm excimer lamp on the properties of the grown films has been studied. The optical properties determined by UV spectrophotometry were also found to be a sensitive function of oxygen pressure in the chamber. At an O2 pressure of 0.2 mbar and deposition temperatures between 400 and 500 °C, the refractive index of the films was around 2.18 which is very close to the bulk Ta2O5 value of 2.2, and an optical transmittance around 90% in the visible region of the spectrum was obtained. X-ray diffraction measurements showed that the as-deposited films were amorphous at temperatures below 500 °C and possessed an orthorhombic (β-Ta2O5) crystal structure at temperatures above 600 °C. The most significant result of the present study was that oxygen pressure could be used to control the composition and modulate optical band gap of the films. It was also found that UV annealing can significantly improve the optical and electrical properties of the films deposited at low oxygen pressures (<0.1 mbar).

  18. Deposition and Characterization of Zinc Oxide Films

    Directory of Open Access Journals (Sweden)

    Seniye KARAKAYA

    2014-07-01

    Full Text Available Zinc oxide (ZnO is suitable for optoelectronic applications due to its electrical and optical properties. The present work deals with the preparation and characterization of ZnO films deposited by the ultrasonic spray pyrolysis method. The starting solution was zinc acetate. Effects of substrate temperature on films properties have been investigated. Optical properties of the films have been characterized by investigating transmittance, absorbance and photoluminescence (PL spectra. Optical transmission spectrum shows that ZnO films have high transmission (about 80% in visible region for substrate temperatures at 350oC. Surface morphology of the films has also been analyzed by atomic force microscope (AFM. Four probes conductivity measurements have been used for electrical characterization. The resistivity of ZnO films increases with increasing substrate temperatures

  19. Iron films deposited on porous alumina substrates

    Science.gov (United States)

    Yamada, Yasuhiro; Tanabe, Kenichi; Nishida, Naoki; Kobayashi, Yoshio

    2016-12-01

    Iron films were deposited on porous alumina substrates using an arc plasma gun. The pore sizes (120 - 250 nm) of the substrates were controlled by changing the temperature during the anodic oxidation of aluminum plates. Iron atoms penetrated into pores with diameters of less than 160 nm, and were stabilized by forming γ-Fe, whereas α-Fe was produced as a flat plane covering the pores. For porous alumina substrates with pore sizes larger than 200 nm, the deposited iron films contained many defects and the resulting α-Fe had smaller hyperfine magnetic fields. In addition, only a very small amount of γ-Fe was obtained. It was demonstrated that the composition and structure of an iron film can be affected by the surface morphology of the porous alumina substrate on which the film is grown.

  20. Laser deposition of bimetallic island films

    Science.gov (United States)

    Kucherik, A. O.; Arakelyan, S. M.; Kutrovskaya, S. V.; Osipov, A. V.; Istratov, A. V.; Vartanyan, T. A.; Itina, T. E.

    2016-08-01

    In this work the results of a bimetallic Au-Ag structure deposition from the colloidal system by nanosecond laser radiation are presented. The formation of the extended arrays of gold and silver nanoparticles with controlled morphology is examined. We report the results of formation bimetallic islands films with various electrical and optical properties. The changes in the optical properties of the obtained thin films are found to depend on their morphology.

  1. Physical Vapor Deposition of Thin Films

    Science.gov (United States)

    Mahan, John E.

    2000-01-01

    A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: * Thermal evaporation, sputtering, and pulsed laser deposition techniques * Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges * Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets * Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam

  2. Deposition of biopolymer films on micromechanical sensors

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Gammelgaard, Lene; Jensen, Marie P.

    2011-01-01

    The influence of various parameters on the spray-coating of thin films of poly(l-lactide) (PLLA) was investigated. The optimized processing conditions were used for deposition of the biodegradable polymer on arrays of SU-8 microcantilevers. The resonance frequency of the cantilevers before and af...

  3. Pulsed laser deposition of nanostructured Ag films

    Energy Technology Data Exchange (ETDEWEB)

    Donnelly, Tony [School of Physics, Trinity College, Dublin 2 (Ireland); Doggett, Brendan [School of Physics, Trinity College, Dublin 2 (Ireland); Lunney, James G. [School of Physics, Trinity College, Dublin 2 (Ireland)]. E-mail: jlunney@tcd.ie

    2006-04-30

    Ultra-thin (0.5-5 nm) films of Ag have been prepared by pulsed laser deposition in vacuum using a 26 ns KrF excimer laser at 1 J cm{sup -2}. The deposition was controlled using a Langmuir ion probe and a quartz crystal thickness monitor. Transmission electron microscopy showed that the films are not continuous, but are structured on nanometer size scales. Optical absorption spectra showed the expected surface plasmon resonance feature, which shifted to longer wavelength and increased in strength as the equivalent film thickness was increased. It is shown that Maxwell Garnett effective medium theory can be used to calculate the main features of optical absorption spectra.

  4. Potentiostatic Deposition and Characterization of Cuprous Oxide Thin Films

    OpenAIRE

    2013-01-01

    Electrodeposition technique was employed to deposit cuprous oxide Cu2O thin films. In this work, Cu2O thin films have been grown on fluorine doped tin oxide (FTO) transparent conducting glass as a substrate by potentiostatic deposition of cupric acetate. The effect of deposition time on the morphologies, crystalline, and optical quality of Cu2O thin films was investigated.

  5. Silicon carbide and other films and method of deposition

    Science.gov (United States)

    Mehregany, Mehran (Inventor); Zorman, Christian A. (Inventor); Fu, Xiao-An (Inventor); Dunning, Jeremy (Inventor)

    2011-01-01

    A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlled properties and devices, particularly MEMS and NEMS devices, having substrates with films having these properties.

  6. Pulsed laser deposition of ferroelectric thin films

    Science.gov (United States)

    Sengupta, Somnath; McKnight, Steven H.; Sengupta, Louise C.

    1997-05-01

    It has been shown that in bulk ceramic form, the barium to strontium ratio in barium strontium titanium oxide (Ba1- xSrxTiO3, BSTO) affects the voltage tunability and electronic dissipation factor in an inverse fashion; increasing the strontium content reduces the dissipation factor at the expense of lower voltage tunability. However, the oxide composites of BSTO developed at the Army Research Laboratory still maintain low electronic loss factors for all compositions examined. The intent of this study is to determine whether such effects can be observed in the thin film form of the oxide composites. The pulsed laser deposition (PLD) method has been used to deposit the thin films. The different compositions of the compound (with 1 wt% of the oxide additive) chosen were: Ba0.3Sr0.7TiO3, Ba0.4Sr0.6TiO3, Ba0.5Sr0.5TiO3, Ba0.6Sr0.4TiO3, and Ba0.7Sr0.3TiO3. The electronic properties investigated in this study were the dielectric constant and the voltage tunability. The morphology of the thin films were examined using the atomic force microscopy. Fourier transform Raman spectroscopy was also utilized for optical characterization of the thin films. The electronic and optical properties of the thin films and the bulk ceramics were compared. The results of these investigations are discussed.

  7. VUV-light-induced deposited silica films

    Science.gov (United States)

    Buck, Christopher K.; Pedraza, Anthony J.; Benson, Roberto S.; Park, Jae-Won

    1998-05-01

    A novel technique to deposit dielectric films at room temperature is described. The deposition of the silica takes place inside a cylindrical glass chamber where a silent discharge is generated between two electrodes connected to a high voltage, high frequency AC source. The chamber contains two parallel glass tubes where the electrodes are located and is filled with argon or xenon at a pressure of 100 mbar. Under these conditions, it has been shown that high intensity VUV light is generated peaking at 126 nm for argon and at 172 nm for xenon. This VUV radiation seems to produce photoablation of the glass tubes that surround the electrodes. Upon operation of the lamp, polyimide, polypropylene and silicon wafer substrates lying at the bottom of the vessel became coated with silica. The films, identified using X-ray photoelectron spectroscopy (XPS), revealed that the silica is oxygen-deficient with a composition of SiO x where x is between 1.7 and 1.8. The deposition rate on silicon wafers was measured by ellipsometry. When Xe gas is used the deposition rate is much lower than when Ar is used. This result is consistent with a photoablation process since the energy of the photons generated in Ar peaks at 10 eV while those generated in Xe peaks at 7 eV. These energy values should be compared with the O-Si bond strength energy that is 8.3 eV. The morphology and structure of the films were examined by scanning and transmission electron microscopies. Deposition of carbonaceous films occurred when the glass tubes containing the electrodes were coated with carbon.

  8. Pulsed laser deposition of pepsin thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kecskemeti, G. [Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Dom ter 9 (Hungary)]. E-mail: kega@physx.u-szeged.hu; Kresz, N. [Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Dom ter 9 (Hungary); Smausz, T. [Hungarian Academy of Sciences and University of Szeged, Research Group on Laser Physics, H-6720 Szeged, Dom ter 9 (Hungary); Hopp, B. [Hungarian Academy of Sciences and University of Szeged, Research Group on Laser Physics, H-6720 Szeged, Dom ter 9 (Hungary); Nogradi, A. [Department of Ophthalmology, University of Szeged, H-6720, Szeged, Koranyi fasor 10-11 (Hungary)

    2005-07-15

    Pulsed laser deposition (PLD) of organic and biological thin films has been extensively studied due to its importance in medical applications among others. Our investigations and results on PLD of a digestion catalyzing enzyme, pepsin, are presented. Targets pressed from pepsin powder were ablated with pulses of an ArF excimer laser ({lambda} = 193 nm, FWHM = 30 ns), the applied fluence was varied between 0.24 and 5.1 J/cm{sup 2}. The pressure in the PLD chamber was 2.7 x 10{sup -3} Pa. The thin layers were deposited onto glass and KBr substrates. Our IR spectroscopic measurements proved that the chemical composition of deposited thin films is similar to that of the target material deposited at 0.5 and 1.3 J/cm{sup 2}. The protein digesting capacity of the transferred pepsin was tested by adapting a modified 'protein cube' method. Dissolution of the ovalbumin sections proved that the deposited layers consisted of catalytically active pepsin.

  9. Deposition and characterization of CuInS2 thin films deposited over copper thin films

    Science.gov (United States)

    Thomas, Titu; Kumar, K. Rajeev; Kartha, C. Sudha; Vijayakumar, K. P.

    2015-06-01

    Simple, cost effective and versatile spray pyrolysis method is effectively combined with vacuum evaporation for the deposition of CuIns2 thin films for photovoltaic applications. In the present study In2s3 was spray deposited over vacuum evaporated Cu thin films and Cu was allowed to diffuse in to the In2S3 layer to form CuInS2. To analyse the dependence of precursor volume on the formation of CuInS2 films structural, electrical and morphological analzes are carried out. Successful deposition of CuInS2thin films with good crystallinity and morphology with considerably low resistivity is reported in this paper.

  10. Strontium-Doped Lanthanum Manganite Films Prepared by Magnetic Deposition

    DEFF Research Database (Denmark)

    Menon, Mohan; Larsen, Casper; Andersen, Kjeld Bøhm

    2009-01-01

    Deposition of La0.85Sr0.15MnO3 (LSM) films from suspensions using a magnetic field was found to be a cheap and quick technique. Ninety weight percent of the particles present in the suspensions were deposited within the first minute of the deposition, and the thickness of the film varied linearly...

  11. Resonant infrared pulsed laser deposition of thin biodegradable polymer films

    DEFF Research Database (Denmark)

    Bubb, D.M.; Toftmann, B.; Haglund Jr., R.F.

    2002-01-01

    Thin films of the biodegradable polymer poly(DL-lactide-co-glycolide) (PLGA) were deposited using resonant infrared pulsed laser deposition (RIR-PLD). The output of a free-electron laser was focused onto a solid target of the polymer, and the films were deposited using 2.90 (resonant with O-H str...

  12. Stress in and texture of PVD deposited metal nitride films

    NARCIS (Netherlands)

    Machunze, R.

    2010-01-01

    Thin metal nitride films deposited by Physical Vapor Deposition (PVD) are used amongst many other applications as wear protective coatings in tool industry or as diffusion barriers in integrated circuit technology. Typically these films exhibit a residual in-plane stress when deposited onto rigid su

  13. CdTe Films Deposited by Closed-space Sublimation

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    CdTe films are prepared by closed-space sublimation technology. Dependence of film crystalline on substrate materials and substrate temperature is investigated. It is found that films exhibit higher crystallinity at substrate temperature higher than 400℃. And the CdTe films deposited on CdS films with higher crystallinity have bigger crystallite and higher uniformity. Treatment with CdCl2 methanol solution promotes the crystallite growth of CdTe films during annealing.

  14. Pulsed laser deposition and characterization of Alnico5 magnetic films

    Energy Technology Data Exchange (ETDEWEB)

    Butt, M.Z., E-mail: mzbutt49@yahoo.com [Department of Physics, GC University, Lahore 54000 (Pakistan); Ali, Dilawar [Department of Physics, GC University, Lahore 54000 (Pakistan); Ahmad, Fayyaz [Department of Physics, University of Engineering and Technology, Lahore 54890 (Pakistan); Magnetophotonics Research Laboratory, Department of Physics, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2013-09-01

    Alnico5 films were deposited by pulsed laser deposition on glass substrate at room temperature under a vacuum ∼10{sup −3} Torr in the absence and in the presence of 500 Oe external transverse magnetic field applied on the plasma plume during film deposition. For this purpose, Nd:YAG laser was employed to ablate the Alnico5 target. The ablated material was deposited on glass substrate placed at a distance of 2 cm from the target. The structural and magnetic properties of the film were analyzed by X-ray diffraction, atomic force microscope, and vibrating sample magnetometer. X-ray diffraction patterns showed that the Alnico5 films were amorphous in nature. Atomic force microscopy revealed that the Alnico5 film deposited in absence of external magnetic field has larger root-mean-square roughness value (60.2 nm) than the magnetically deposited film (42.9 nm). Vibrating sample magnetometer measurements showed that the in-plane saturation magnetization of Alnico5 film deposited in the presence of external magnetic field increases by 32% as compared to that for the film deposited in the absence of external magnetic field. However, the out-of-plane saturation magnetization was almost independent of the external magnetic field. In magnetically deposited film, there is in-plane anisotropy parallel to the applied external magnetic field.

  15. Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view

    CSIR Research Space (South Africa)

    Modibedi, M

    2011-09-01

    Full Text Available Electrochemical atomic layer deposition technique is selected as one of the methods to prepare thin films for various applications, including electrocatalytic materials and compound....

  16. The mechanical properties of thin alumina film deposited by metal-organic chemical vapour deposition

    NARCIS (Netherlands)

    Haanappel, V.A.C.; Gellings, P.J.; Vendel, van de D.; Metselaar, H.S.C.; Corbach, van H.D.; Fransen, T.

    1995-01-01

    Amorphous alumina films were deposited by metal-organic chemical vapour deposition (MOCVD) on stainless steel, type AISI 304. The MOCVD experiments were performed in nitrogen at low and atmospheric pressures. The effects of deposition temperature, growth rate and film thickness on the mechanical pro

  17. Deposition of Aluminium Oxide Films by Pulsed Reactive Sputtering

    Institute of Scientific and Technical Information of China (English)

    Xinhui MAO; Bingchu CAI; Maosong WU; Guoping CHEN

    2003-01-01

    Pulsed reactive sputtering is a novel process used to deposit some compound films, which are not deposited by traditional D.C. reactive sputtering easily. In this paper some experimental results about the deposition of Al oxide films by pulsed reactive sputtering are presented. The hysteresis phenomenon of the sputtering voltage and deposition rate with the change of oxygen flow during sputtering process are discussed.

  18. Room-Temperature Deposition of NbN Superconducting Films

    Science.gov (United States)

    Thakoor, S.; Lamb, J. L.; Thakoor, A. P.; Khanna, S. K.

    1986-01-01

    Films with high superconducting transition temperatures deposited by reactive magnetron sputtering. Since deposition process does not involve significantly high substrate temperatures, employed to deposit counter electrode in superconductor/insulator/superconductor junction without causing any thermal or mechanical degradation of underlying delicate tunneling barrier. Substrates for room-temperature deposition of NbN polymeric or coated with photoresist, making films accessible to conventional lithographic patterning techniques. Further refinements in deposition technique yield films with smaller transition widths, Tc of which might approach predicted value of 18 K.

  19. Deposition of electrochromic tungsten oxide thin films by plasma-enhanced chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Henley, W.B.; Sacks, G.J. [Univ. of South Florida, Tampa, FL (United States). Center of Microelectronics

    1997-03-01

    Use of plasma-enhanced chemical vapor deposition (PECVD) for electrochromic WO{sub 3} film deposition is investigated. Oxygen, hydrogen, and tungsten hexafluoride were used as source gases. Reactant gas flow was investigated to determine the effect on film characteristics. High quality optical films were obtained at deposition rates on the order of 100 {angstrom}/s. Higher deposition rates were attainable but film quality and optical coherence degraded. Atomic emission spectroscopy (AES), was used to provide an in situ assessment of the plasma deposition chemistry. Through AES, it is shown that the hydrogen gas flow is essential to the deposition of the WO{sub 3} film. Oxygen gas flow and tungsten hexafluoride gas flow must be approximately equal for high quality films.

  20. On the uniformity of films fabricated by glancing angle deposition

    Science.gov (United States)

    Wakefield, Nicholas G.; Sit, Jeremy C.

    2011-04-01

    Films fabricated using the glancing angle deposition technique are subject to significant variations in several important film parameters across a sample due to geometric conditions that are not uniform across the substrate. This paper presents a method to quantify the non-uniformities in these quantities, starting from a generalized geometric framework, for low-pressure, physical vapor deposition of thin films on substrates of arbitrary size and position. This method is applicable to any glancing angle deposition setup including substrate tilt and rotation but focuses on the case of constant deposition angle and arbitrary azimuthal rotation. While some quantities, such as the effective deposition angle and the deposited mass per unit area at any given point on the substrate can be determined purely from the geometry of the deposition setup, obtaining further quantities, such as the film density and thickness, requires additional, material-specific information that is easily measured.

  1. Characterization of copper selenide thin films deposited by chemical bath deposition technique

    Science.gov (United States)

    Al-Mamun; Islam, A. B. M. O.

    2004-11-01

    A low-cost chemical bath deposition (CBD) technique has been used for the preparation of Cu2-xSe thin films onto glass substrates and deposited films were characterized by X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and UV-vis spectrophotometry. Good quality thin films of smooth surface of copper selenide thin films were deposited using sodium selenosulfate as a source of selenide ions. The structural and optical behaviour of the films are discussed in the light of the observed data.

  2. ZnO thin films prepared by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Tsoutsouva, M.G. [Laboratory of Physical Metallurgy, National Technical University of Athens, Zografos, 15780 Athens (Greece); Panagopoulos, C.N., E-mail: chpanag@metal.ntua.gr [Laboratory of Physical Metallurgy, National Technical University of Athens, Zografos, 15780 Athens (Greece); Papadimitriou, D. [National Technical University of Athens, Department of Physics, GR-15780 Athens (Greece); Fasaki, I.; Kompitsas, M. [Theor. and Phys./Chem. Institute, National Hellenic Research Foundation, 48 Vas. Konstantinou Ave., 11635 Athens (Greece)

    2011-04-15

    Zinc oxide (ZnO) thin films were deposited on soda lime glass substrates by pulsed laser deposition (PLD) in an oxygen-reactive atmosphere. The structural, optical, and electrical properties of the as-prepared thin films were studied in dependence of substrate temperature and oxygen pressure. High quality polycrystalline ZnO films with hexagonal wurtzite structure were deposited at substrate temperatures of 100 and 300 deg. C. The RMS roughness of the deposited oxide films was found to be in the range 2-9 nm and was only slightly dependent on substrate temperature and oxygen pressure. Electrical measurements indicated a decrease of film resistivity with the increase of substrate temperature and the decrease of oxygen pressure. The ZnO films exhibited high transmittance of 90% and their energy band gap and thickness were in the range 3.26-3.30 eV and 256-627 nm, respectively.

  3. Ion Beam Assisted Deposition Of Optical Thin Films - Recent Results

    Science.gov (United States)

    McNally, J. J.; Al-Jumaily, G. A.; Wilson, S. R.; McNeil, J. R.

    1985-11-01

    We have examined the properties of dielectric (Ti02, Si02, -Al203, Ta205 and Hf02) films deposited using ion-assisted deposition (IAD). The films were characterized using an angularly resolved scatterometer, spectrophotometer and Raman spectroscopy. A reduction in optical scatter, especially that due to low spatial frequencies, is observed for films deposited with simultaneous ion bombardment. Higher values of refractive index are obtained for films deposited using IAD. Raman spectra indicate a crystalline phase change in TiO2 films is induced by bombardment of samples with 02 ions during deposition. Other experimental data and the effects of the induced phase transition on the optical properties of TiO2 will be discussed.

  4. Solution deposition of nanometer scale silver films as an alternative to vapor deposition for plasmonic excitation

    Energy Technology Data Exchange (ETDEWEB)

    Smith, Derek S.; Sathish, R. Sai; Kostov, Yordan [Center for Advanced Sensor Technology and Department of Chemical and Biochemical Engineering, University of Maryland Baltimore County, 1000 Hilltop Circle, Baltimore, MD 21250 (United States); Rao, Govind, E-mail: grao@umbc.ed [Center for Advanced Sensor Technology and Department of Chemical and Biochemical Engineering, University of Maryland Baltimore County, 1000 Hilltop Circle, Baltimore, MD 21250 (United States)

    2010-05-03

    We report the attainment of surface plasmon-coupled emission (SPCE) from highly uniform thin silver films, solution-deposited on glass substrates by a wet chemistry approach. The surface morphology of these films was characterized by atomic force microscopy. The SPCE emission enhancements, polarization and angularity obtained from solution-deposited silver on BK7 glass were comparable to that achieved from conventional SPCE slides prepared via vapor deposition. This facile, wet chemistry procedure for the deposition of SPCE films provides an inexpensive, low maintenance alternative to vapor deposition for SPCE substrate preparation. This would allow the fluorescence observation technique to become more readily available for high sensitivity, low cost applications.

  5. Bismuth thin films obtained by pulsed laser deposition

    Science.gov (United States)

    Flores, Teresa; Arronte, Miguel; Rodriguez, Eugenio; Ponce, Luis; Alonso, J. C.; Garcia, C.; Fernandez, M.; Haro, E.

    1999-07-01

    In the present work Bi thin films were obtained by Pulsed Laser Deposition, using Nd:YAG lasers. The films were characterized by optical microscopy. Raman spectroscopy and X-rays diffraction. It was accomplished the real time spectral emission characterization of the plasma generated during the laser evaporation process. Highly oriented thin films were obtained.

  6. Properties of electrophoretically deposited single wall carbon nanotube films

    Energy Technology Data Exchange (ETDEWEB)

    Lim, Junyoung; Jalali, Maryam; Campbell, Stephen A., E-mail: campb001@umn.edu

    2015-08-31

    This paper describes techniques for rapidly producing a carbon nanotube thin film by electrophoretic deposition at room temperature and determines the film mass density and electrical/mechanical properties of such films. The mechanism of electrophoretic deposition of thin layers is explained with experimental data. Also, film thickness is measured as a function of time, electrical field and suspension concentration. We use Rutherford backscattering spectroscopy to determine the film mass density. Films created in this manner have a resistivity of 2.14 × 10{sup −3} Ω·cm, a mass density that varies with thickness from 0.12 to 0.54 g/cm{sup 3}, and a Young's modulus between 4.72 and 5.67 GPa. The latter was found to be independent of thickness from 77 to 134 nm. We also report on fabricating free-standing films by removing the metal seed layer under the CNT film, and selectively etching a sacrificial layer. This method could be extended to flexible photovoltaic devices or high frequency RF MEMS devices. - Highlights: • We explain the electrophoretic deposition process and mechanism of thin SWCNT film deposition. • Characterization of the SWCNT film properties including density, resistivity, transmittance, and Young's modulus. • The film density and resistivity are found to be a function of the film thickness. • Techniques developed to create free standing layers of SW-CNTs for flexible electronics and mechanical actuators.

  7. Influence of deposition time on the properties of chemical bath deposited manganese sulfide thin films

    Directory of Open Access Journals (Sweden)

    Anuar Kassim

    2010-12-01

    Full Text Available Manganese sulfide thin films were chemically deposited from an aqueous solution containing manganese sulfate, sodium thiosulfate and sodium tartrate. The influence of deposition time (2, 3, 6 and 8 days on the properties of thin films was investigated. The structure and surface morphology of the thin films were studied by X-ray diffraction and atomic force microscopy, respectively. In addition, in order to investigate the optical properties of the thin films, the UV-visible spectrophotometry was used. The XRD results indicated that the deposited MnS2 thin films exhibited a polycrystalline cubic structure. The number of MnS2 peaks on the XRD patterns initially increased from three to six peaks and then decreased to five peaks, as the deposition time was increased from 2 to 8 days. From the AFM measurements, the film thickness and surface roughness were found to be dependent on the deposition time.

  8. Plasma-deposited a-C(N) H films

    CERN Document Server

    Franceschini, D E

    2000-01-01

    The growth behaviour, film structure and mechanical properties of plasma-deposited amorphous hydrogenated carbon-nitrogen films are shortly reviewed. The effect of nitrogen-containing gas addition to the deposition to the hydrocarbon atmospheres used is discussed, considering the modifications observed in the chemical composition growth kinetics, carbon atom hybridisation and chemical bonding arrangements of a-C(N):H films. The overall structure behaviour is correlated to the variation of the mechanical properties.

  9. Deposition of copper selenide thin films and nanoparticles

    Science.gov (United States)

    Hu, Yunxiang; Afzaal, Mohammad; Malik, Mohammad A.; O'Brien, Paul

    2006-12-01

    A new method is reported for the growth of copper selenide thin films and nanoparticles using copper acetylacetonate and trioctylphosphine selenide. Aerosol-assisted chemical vapor deposition experiments lead to successful deposition of tetragonal Cu 2Se films. In contrast, hexadecylamine capped nanoparticles are composed of cubic Cu 2-xSe. The deposited materials are optically and structurally characterized. The results of this comprehensive study are described and discussed.

  10. Effects of deposition time in chemically deposited ZnS films in acidic solution

    Energy Technology Data Exchange (ETDEWEB)

    Haddad, H.; Chelouche, A., E-mail: azeddinechelouche@gmail.com; Talantikite, D.; Merzouk, H.; Boudjouan, F.; Djouadi, D.

    2015-08-31

    We report an experimental study on the synthesis and characterization of zinc sulfide (ZnS) single layer thin films deposited on glass substrates by chemical bath deposition technique in acidic solution. The effect of deposition time on the microstructure, surface morphology, optical absorption, transmittance, and photoluminescence (PL) was investigated by X-ray diffraction (XRD), scanning electronic microscopy (SEM), UV-Vis–NIR spectrophotometry and photoluminescence (PL) spectroscopy. The results showed that the samples exhibit wurtzite structure and their crystal quality is improved by increasing deposition time. The latter, was found to affect the morphology of the thin films as showed by SEM micrographs. The optical measurements revealed a high transparency in the visible range and a dependence of absorption edge and band gap on deposition time. The room temperature PL spectra indicated that all ZnS grown thin films emit a UV and blue light, while the band intensities are found to be dependent on deposition times. - Highlights: • Single layer ZnS thin films were deposited by CBD in acidic solution at 95 °C. • The effect of deposition time was investigated. • Coexistence of ZnS and ZnO hexagonal structures for time deposition below 2 h • Thicker ZnS films were achieved after monolayer deposition for 5 h. • The highest UV-blue emission observed in thin film deposited at 5 h.

  11. Spatial atomic layer deposition of zinc oxide thin films

    NARCIS (Netherlands)

    Illiberi, A.; Roozeboom, F.; Poodt, P.W.G.

    2012-01-01

    Zinc oxide thin films have been deposited at high growth rates (up to ~1 nm/s) by spatial atomic layer deposition technique at atmospheric pressure. Water has been used as oxidant for diethylzinc (DEZ) at deposition temperatures between 75 and 250 °C. The electrical, structural (crystallinity and mo

  12. SnS thin films deposited by chemical bath deposition, dip coating and SILAR techniques

    Science.gov (United States)

    Chaki, Sunil H.; Chaudhary, Mahesh D.; Deshpande, M. P.

    2016-05-01

    The SnS thin films were synthesized by chemical bath deposition (CBD), dip coating and successive ionic layer adsorption and reaction (SILAR) techniques. In them, the CBD thin films were deposited at two temperatures: ambient and 70 °C. The energy dispersive analysis of X-rays (EDAX), X-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy (SEM) and optical spectroscopy techniques were used to characterize the thin films. The electrical transport properties studies on the as-deposited thin films were done by measuring the I-V characteristics, DC electrical resistivity variation with temperature and the room temperature Hall effect. The obtained results are deliberated in this paper.

  13. Crystalline Indium Sulphide thin film by photo accelerated deposition technique

    Science.gov (United States)

    Dhanya, A. C.; Preetha, K. C.; Deepa, K.; Remadevi, T. L.

    2015-02-01

    Indium sulfide thin films deserve special attention because of its potential application as buffer layers in CIGS based solar cells. Highly transparent indium sulfide (InS) thin films were prepared using a novel method called photo accelerated chemical deposition (PCD). Ultraviolet source of 150 W was used to irradiate the solution. Compared to all other chemical methods, PCD scores its advantage for its low cost, flexible substrate and capable of large area of deposition. Reports on deposition of high quality InS thin films at room temperature are very rare in literature. The precursor solution was initially heated to 90°C for ten minutes and then deposition was carried out at room temperature for two hours. The appearance of the film changed from lemon yellow to bright yellow as the deposition time increased. The sample was characterized for its structural and optical properties. XRD profile showed the polycrystalline behavior of the film with mixed phases having crystallite size of 17 nm. The surface morphology of the films exhibited uniformly distributed honey comb like structures. The film appeared to be smooth and the value of extinction coefficient was negligible. Optical measurements showed that the film has more than 80% transmission in the visible region. The direct band gap energy was 2.47eV. This method is highly suitable for the synthesis of crystalline and transparent indium sulfide thin films and can be used for various photo voltaic applications.

  14. Nanocrystalline Diamond Films Deposited by Electron Assisted Hot Filament Chemical Vapor Deposition

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    Nanocrystalline diamond films were deposited on polished Si wafer surface with electron assisted hot filament chemical vapor deposition at 1 kPa gas pressure, the deposited films were characterized and observed by Raman spectrum, X-ray diffraction, atomic force microscopy and semiconductor characterization system. The results show that when 8 A bias current is applied for 5 h, the surface roughness decreases to 28.5 nm. After 6 and 8 A bias current are applied for 1 h, and the nanocrystalline films deposition continue for 4 h with 0 A bias current at 1 kPa gas pressure. The nanocrystalline diamond films with 0.5×109 and 1×1010 Ω·cm resistivity respectively are obtained. It is demonstrated that electron bombardment plays an important role of nucleation to deposit diamond films with smooth surface and high resistivity.

  15. Sputtering deposition and characterization of ultrathin amorphous carbon films

    Science.gov (United States)

    Lu, Wei

    1999-11-01

    This dissertation focuses on experimental investigations of ultrathin, ultrasmooth amorphous carbon (a-C) films deposited on Si(100) substrates by radio frequency (RF) sputtering and characterization of the nanomechanical and nanotribological properties and thermal stability of the films. Ultrathin a-C films of thickness 5--100 nm and typical root-mean-square roughness of 0.15--1 nm were deposited on ultrasmooth Si(100) substrates using pure argon as the sputtering gas. A low-pressure RF argon discharge model was used to analyze the plasma parameters in the film growth environment. These plasma parameters correlate the deposition conditions with the film growth processes. Atomic force microscopy (AFM) and surface force microscopy (SFM) were used to characterize the nanomechanical and nanotribological properties of the a-C films. X-ray photoelectron spectroscopy (XPS) was used to investigate the compositions and microstructures of the films. Sputter-etching measurements of the a-C films by energetic argon ion bombardment were used to study the surface binding energy of carbon atoms in a-C films deposited under different conditions. The dependence of film properties on deposition conditions was studied, and relations between nanomechanical and nanotribological properties were discussed in terms of a modified deformation index. The deformation and nanotribology mechanisms of the a-C films were compared with those of other films, such as TiC and Cr films (both 100 nm thick), and bulk Si(100). Reactive RF sputtering of nitrogenated amorphous carbon (a-CNx) films was investigated by introducing nitrogen into the a-C films during film growth by using an argon-nitrogen gas mixture as the sputtering gas. The alloying effect of nitrogen on the film growth and properties, such as hardness and surface energy, was studied and interpreted in terms of the changes in the plasma environment induced due to differences in the composition of the sputtering gas mixture. The thermal

  16. Iridium thin films deposited via pulsed laser deposition for future applications as transition-edge sensors

    Energy Technology Data Exchange (ETDEWEB)

    Galeazzi, M. E-mail: galeazzi@physics.miami.edu; Chen, C.; Cohn, J.L.; Gundersen, J.O

    2004-03-11

    The University of Miami has recently started developing and studying high-resolution microcalorimeters operating near 100 mK for X-ray and particle physics and astrophysics. These detectors will be based on Transition Edge Sensors technology fabricated using iridium thin films deposited via the Pulsed Laser Deposition technique. We report here the preliminary result of the room temperature characterization of the Ir thin films, and an overview of future plans to use the films as transition edge sensors.

  17. Electrical Field Effects in Phthalocyanine Film Growth by Vapor Deposition

    Science.gov (United States)

    Banks, Curtis E.; Zhu, Shen; Frazier, Donald O.; Penn, Benjamin; Abdeldayem, Hossin; Hicks, Roslin; Sarkisov, Sergey

    1999-01-01

    Phthalocyanine, an organic material, is a very good candidate for non-linear optical application, such as high-speed switching and optical storage devices. Phthalocyanine films have been synthesized by vapor deposition on quartz substrates. Some substrates were coated with a very thin gold film for introducing electrical field. These films have been characterized by surface morphology, material structure, chemical and thermal stability, non-linear optical parameters, and electrical behaviors. The films have excellent chemical and optical stability. However, the surface of these films grown without electrical field shows flower-like morphology. When films are deposited under an electrical field ( an aligned structure is revealed on the surface. A comparison of the optical and electrical properties and the growth mechanism for these films grown with and without an electrical field will be discussed.

  18. Characterization and Electrical Properties of TiO2 Thin Films Deposited by Pulsed Laser Deposition

    Science.gov (United States)

    Badar, Nurhanna; Kamarulzaman, Norlida

    2011-12-01

    Thin film technology is very important in today's high-tech industry. TiO2 is a high-k dielectric material. Problems with thin film deposition arise when the thickness of the thin layers approaches a few hundred nm to less than 100 nm. High quality thin films within these dimensions are difficult to obtain. Issues of adhesion, crystal mismatch, crystal orientation, surface roughness, densification, etc. are problems that need to be addressed if good quality thin films for devices are to be fabricated. These factors have a relation with the thin film technique used. As an example, spin coating technique may be a cheaper technique but may not result in dense and very smooth surfaces. Pulsed LASER deposition (PLD) is a relatively newer method used in thin film fabrication. The advantages of PLD are, capability of very thin films being deposited on different types of substrates (up to monolayers), control of crystal orientation, capability of depositing materials with complex stoichiometry and ease of methodology with high throughput. This has industrial implications as a good method for thin film preparation. This work involves the deposition of TiO2 thin films using different deposition parameters and chamber environments.

  19. Chemical solution deposition of functional oxide thin films

    CERN Document Server

    Schneller, Theodor; Kosec, Marija

    2014-01-01

    Chemical Solution Deposition (CSD) is a highly-flexible and inexpensive technique for the fabrication of functional oxide thin films. Featuring nearly 400 illustrations, this text covers all aspects of the technique.

  20. Dual Ion Beam Deposition Of Diamond Films On Optical Elements

    Science.gov (United States)

    Deutchman, Arnold H.; Partyka, Robert J.; Lewis, J. C.

    1990-01-01

    Diamond film deposition processes are of great interest because of their potential use for the formation of both protective as well as anti-reflective coatings on the surfaces of optical elements. Conventional plasma-assisted chemical vapor deposition diamond coating processes are not ideal for use on optical components because of the high processing temperatures required, and difficulties faced in nucleating films on most optical substrate materials. A unique dual ion beam deposition technique has been developed which now makes possible deposition of diamond films on a wide variety of optical elements. The new DIOND process operates at temperatures below 150 aegrees Farenheit, and has been used to nucleate and grow both diamondlike carbon and diamond films on a wide variety of optical :taterials including borosilicate glass, quartz glass, plastic, ZnS, ZnSe, Si, and Ge.

  1. Chemical bath ZnSe thin films: deposition and characterisation

    Science.gov (United States)

    Lokhande, C. D.; Patil, P. S.; Ennaoui, A.; Tributsch, H.

    1998-01-01

    The zinc selenide (ZnSe) thin films have been deposited by a simple and inexpensive chemical bath deposition (CBD) method. The selenourea was used as a selenide ion source. The ZnSe films have been characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDAX), Rutherford back scattering (RBS), and optical absorption. The as-deposited ZnSe films on various substrates are found to be amorphous and contain O2 and N2 in addition to Zn and Se. The optical band gap of the film is estimated to be 2.9 eV. The films are photoactive as evidenced by time resolved microwave conductivity (TRMC).

  2. Nitrogen incorporation in sputter deposited molybdenum nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Stöber, Laura, E-mail: laura.stoeber@tuwien.ac.at; Patocka, Florian, E-mail: florian.patocka@tuwien.ac.at; Schneider, Michael, E-mail: michael.schneider@tuwien.ac.at; Schmid, Ulrich, E-mail: ulrich.e366.schmid@tuwien.ac.at [Institute of Sensor and Actuator Systems, TU Wien, Gußhausstraße 27-29, A-1040 Vienna (Austria); Konrath, Jens Peter, E-mail: jenspeter.konrath@infineon.com; Haberl, Verena, E-mail: verena.haberl@infineon.com [Infineon Technologies Austria AG, Siemensstraße 2, 9500 Villach (Austria)

    2016-03-15

    In this paper, the authors report on the high temperature performance of sputter deposited molybdenum (Mo) and molybdenum nitride (Mo{sub 2}N) thin films. Various argon and nitrogen gas compositions are applied for thin film synthetization, and the amount of nitrogen incorporation is determined by Auger measurements. Furthermore, effusion measurements identifying the binding conditions of the nitrogen in the thin film are performed up to 1000 °C. These results are in excellent agreement with film stress and scanning electron microscope analyses, both indicating stable film properties up to annealing temperatures of 500 °C.

  3. Continuous wave infrared laser deposition of organic thin films

    Energy Technology Data Exchange (ETDEWEB)

    Yaginuma, Seiichiro [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Yamaguchi, Jun [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Haemori, Masamitsu [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Itaka, Kenji [Department of Advanced Materials Science, Graduate School of Frontier Sciences, Univesity of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8568 (Japan); Matsumoto, Yuji [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Kondo, Michio [Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta, Midori, Yokohama 226-8503 (Japan); Koinuma, Hideomi [Department of Advanced Materials Science, Graduate School of Frontier Sciences, Univesity of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8568 (Japan)

    2007-04-15

    We developed a continuous-wave infrared laser molecular beam epitaxy (CW-IR-LMBE) optimized for the fabrication of organic semiconductor films. The crystal quality of these organic thin films deposited by CW-IR-LMBE was substantially the same as those deposited by thermal evaporation. Due to the possibility of quick switching of evaporation sources, CW-IR-LMBE is especially advantageous for rapid screening of composition, thickness, and fabrication parameters in materials and device optimization based on combinatorial technology.

  4. ZnS thin film deposited with chemical bath deposition process directed by different stirring speeds

    Science.gov (United States)

    Zhang, Y.; Dang, X. Y.; Jin, J.; Yu, T.; Li, B. Z.; He, Q.; Li, F. Y.; Sun, Y.

    2010-09-01

    In this combined film thickness, scanning electron microscopy (SEM), X-ray diffraction and optical properties study, we explore the effects of different stirring speeds on the growth and optical properties of ZnS film deposited by CBD method. From the disclosed changes of thickness of ZnS film, we conclude that film thickness is independent of the stirring speeds in the heterogeneous process (deposition time less than 40 min), but increases with the stirring speeds and/or deposition time increasing in the homogeneous process. Grazing incident X-ray diffraction (GIXRD) and the study of optical properties disclosed that the ZnS films grown with different stirring speeds show partially crystallized film and exhibit good transmittance (70-88% in the visible region), but the stirring speeds cannot give much effects on the structure and optical properties in the homogeneous process.

  5. Hardness and stress of amorphous carbon film deposited by glow discharge and ion beam assisting deposition

    CERN Document Server

    Marques, F C

    2000-01-01

    The hardness and stress of amorphous carbon films prepared by glow discharge and by ion beam assisting deposition are investigated. Relatively hard and almost stress free amorphous carbon films were deposited by the glow discharge technique. On the other hand, by using the ion beam assisting deposition, hard films were also obtained with a stress of the same order of those found in tetrahedral amorphous carbon films. A structural analysis indicates that all films are composed of a sp sup 2 -rich network. These results contradict the currently accepted concept that both stress and hardness are only related to the concentration of sp sup 3 sites. Furthermore, the same results also indicate that the sp sup 2 sites may also contribute to the hardness of the films.

  6. Thin film zinc oxide deposited by CVD and PVD

    Science.gov (United States)

    Hamelmann, Frank U.

    2016-10-01

    Zinc oxide is known as a mineral since 1810, but it came to scientific interest after its optoelectronic properties found to be tuneable by p-type doping. Since the late 1980’s the number of publications increased exponentially. All thin film deposition technologies, including sol-gel and spray pyrolysis, are able to produce ZnO films. However, for outstanding properties and specific doping, only chemical vapor deposition and physical vapor deposition have shown so far satisfying results in terms of high conductivity and high transparency. In this paper the different possibilities for doping will be discussed, some important applications of doped ZnO thin films will be presented. The deposition technologies used for industrial applications are shown in this paper. Especially sputtering of aluminium doped Zinc Oxide (ZnO:Al or AZO) and LPCVD of boron doped Zinc Oxide (ZnO:B or BZO) are used for the commercial production of transparent conductive oxide films on glass used for thin film photovoltaic cells. For this special application the typical process development for large area deposition is presented, with the important trade-off between optical properties (transparency and ability for light scattering) and electrical properties (conductivity). Also, the long term stability of doped ZnO films is important for applications, humidity in the ambient is often the reason for degradation of the films. The differences between the mentioned materials are presented.

  7. Contamination control in ion beam sputter-deposited films

    Science.gov (United States)

    Pearson, David I. C.; Pochon, Sebastien; Cooke, Mike

    2013-09-01

    The conventional wisdom to guarantee high purity thin films in IBSD has been to use a large vacuum chamber usually in excess of 1 m3. The chamber size was important to minimise the effect of reflected high energy particles from the target surface sputtering chamber materials onto the substrate and to allow the use of large targets to avoid beam overspill onto chamber furniture. An improved understanding of beam trajectories and re-sputtered material paths has allowed the deposition of thin films with very low metallic impurity content in a chamber volume below 0.5 m3. Thus, by optimizing the sputter ion source, target and substrate configuration, and by arranging suitable shielding made of an appropriate material in the process chamber, the levels of contaminants in the deposited films have been reduced to a minimum. With this optimum hardware arrangement, the ion beam process parameters were then optimized with respect to the ppm levels of contaminants measured in the films by SIMS analysis. Using the deposition of SiO2 as a standard material for DSIMS composition analysis and impurity level determination, it has been shown that our IBS deposition tool is capable of depositing films with contamination levels of <50ppm for the total of all metal impurities in the deposited films.

  8. Characterization of polymer thin films obtained by pulsed laser deposition

    Science.gov (United States)

    Palla-Papavlu, A.; Dinca, V.; Ion, V.; Moldovan, A.; Mitu, B.; Luculescu, C.; Dinescu, M.

    2011-04-01

    The development of laser techniques for the deposition of polymer and biomaterial thin films on solid surfaces in a controlled manner has attracted great attention during the last few years. Here we report the deposition of thin polymer films, namely Polyepichlorhydrin by pulsed laser deposition. Polyepichlorhydrin polymer was deposited on flat substrate (i.e. silicon) using an NdYAG laser (266 nm, 5 ns pulse duration and 10 Hz repetition rate). The obtained thin films have been characterized by atomic force microscopy, scanning electron microscopy, Fourier transform infrared spectroscopy and spectroscopic ellipsometry. It was found that for laser fluences up to 1.5 J/cm 2 the chemical structure of the deposited polyepichlorhydrin polymer thin layers resembles to the native polymer, whilst by increasing the laser fluence above 1.5 J/cm 2 the polyepichlorohydrin films present deviations from the bulk polymer. Morphological investigations (atomic force microscopy and scanning electron microscopy) reveal continuous polyepichlorhydrin thin films for a relatively narrow range of fluences (1-1.5 J/cm 2). The wavelength dependence of the refractive index and extinction coefficient was determined by ellipsometry studies which lead to new insights about the material. The obtained results indicate that pulsed laser deposition method is potentially useful for the fabrication of polymer thin films to be used in applications including electronics, microsensor or bioengineering industries.

  9. Stress development during deposition of CNx thin films

    Science.gov (United States)

    Broitman, E.; Zheng, W. T.; Sjöström, H.; Ivanov, I.; Greene, J. E.; Sundgren, J.-E.

    1998-05-01

    We have investigated the influence of deposition parameters on stress generation in CNx (0.3films deposited onto Si(001) substrates by reactive magnetron sputtering of C in pure N2 discharges. Film stress, σ, which in all cases is compressive, decreases with an increase in the N2 pressure, PN2, due to structural changes induced by the pressure-dependent variation in the average energy of particles bombarding the film during deposition. The film stress σ is also a function of the film growth temperature, Ts, and exhibits a maximum value of ˜5 GPa at 350 °C. Under these conditions, the films have a distorted microstructure consisting of a three-dimensional, primarily sp2 bonded, network. In contrast, films deposited at Ts<200 °C with a low stress are amorphous. At 350 °Cfilms grown at 350 °C exhibit the highest hardness and elasticity.

  10. Pulsed laser deposition and characterisation of thin superconducting films

    Energy Technology Data Exchange (ETDEWEB)

    Morone, A. [CNR, zona industriale di Tito Scalo, Potenza (Italy). Istituto per i Materiali Speciali

    1996-09-01

    Same concepts on pulsed laser deposition of thin films will be discussed and same examples of high transition temperature (HTc) BiSrCaCuO (BISCO) and low transition temperature NbN/MgO/NbN multilayers will be presented. X-ray and others characterizations of these films will be reported and discussed. Electrical properties of superconducting thin films will be realized as a function of structural and morphological aspect.

  11. Characterization of CdTe films deposited at various bath temperatures and concentrations using electrophoretic deposition.

    Science.gov (United States)

    Daud, Mohd Norizam Md; Zakaria, Azmi; Jafari, Atefeh; Ghazali, Mohd Sabri Mohd; Abdullah, Wan Rafizah Wan; Zainal, Zulkarnain

    2012-01-01

    CdTe film was deposited using the electrophoretic deposition technique onto an ITO glass at various bath temperatures. Four batch film compositions were used by mixing 1 to 4 wt% concentration of CdTe powder with 10 mL of a solution of methanol and toluene. X-ray Diffraction analysis showed that the films exhibited polycrystalline nature of zinc-blende structure with the (111) orientation as the most prominent peak. From the Atomic Force Microscopy, the thickness and surface roughness of the CdTe film increased with the increase of CdTe concentration. The optical energy band gap of film decreased with the increase of CdTe concentration, and with the increase of isothermal bath temperature. The film thickness increased with respect to the increase of CdTe concentration and bath temperature, and following, the numerical expression for the film thickness with respect to these two variables has been established.

  12. Characterization of CdTe Films Deposited at Various Bath Temperatures and Concentrations Using Electrophoretic Deposition

    Directory of Open Access Journals (Sweden)

    Zulkarnain Zainal

    2012-05-01

    Full Text Available CdTe film was deposited using the electrophoretic deposition technique onto an ITO glass at various bath temperatures. Four batch film compositions were used by mixing 1 to 4 wt% concentration of CdTe powder with 10 mL of a solution of methanol and toluene. X-ray Diffraction analysis showed that the films exhibited polycrystalline nature of zinc-blende structure with the (111 orientation as the most prominent peak. From the Atomic Force Microscopy, the thickness and surface roughness of the CdTe film increased with the increase of CdTe concentration. The optical energy band gap of film decreased with the increase of CdTe concentration, and with the increase of isothermal bath temperature. The film thickness increased with respect to the increase of CdTe concentration and bath temperature, and following, the numerical expression for the film thickness with respect to these two variables has been established.

  13. Anticooperativity of FHF hydrogen bonds in clusters of the type F- × (HF)n, RF × (HF)n and XF × (HF)n, R = alkyl and X = H, Br, Cl, F

    Science.gov (United States)

    Kucherov, S. Yu.; Bureiko, S. F.; Denisov, G. S.

    2016-02-01

    Properties of twenty five hydrogen-bonded complexes, namely, F- × (HF)n (n = 1-6), RF × (HF)n (R = t-Bu, i-Pr, Et, Me; n = 1-3), XF × (HF)n (X = H, Br, Cl; n = 1-2), and FF…HF with the hydrogen bond energy varying in a wide range have been calculated using ab initio methods at the MP2/6-31++G** level. For the first time, the energies, geometrical parameters and vibrational frequencies are obtained for the series of clusters, where the bonding character changes from covalent to van der Waals on the variation of proton-acceptor ability of the base, and the energies are in the range of 45-1 kcal/mol. The mutual influence of multiple hydrogen bonds of F…HF type in clusters, in which a fluorine anion or an atom participates in hydrogen bond formation as the acceptor, is systematically investigated. The relative changes in the values of the considered parameters on the sequential addition of an HF molecule (anticooperativity) were determined. It was shown that non-additivity of the interaction is most strongly pronounced in the energy and vibrational frequency values, geometrical parameters of hydrogen bonds are less sensitive to the mutual influence. The anticooperative effect is more pronounced on the hydrogen bridge length R(F...F) than on the geometry of proton donor r(HF). The hydrogen bond formation and the increase of the number n of ligands lead to successive lengthening of the r(XF) bond adjacent to the hydrogen bridge. The length of an XF bond changes stronger on formation of each hydrogen bond than the HF bond length.

  14. Luminescent thin films by the chemical aerosol deposition technology (CADT)

    NARCIS (Netherlands)

    Martin, F.J.; Martin, F.J.; Albers, H.; Lambeck, Paul; Popma, T.J.A.; van de Velde, G.M.H.

    1992-01-01

    Zinc sulphide thin films have been deposited with CART using zinc chlorideand zinc acetylacetonate as Zn compounds and thiourea and 1,1,3,3-tetramethylthiourea as S compounds soluted in methanol, ethanol, isopropanol and cellosolve. After optimalization of the deposition process homogeneous layers

  15. Ubiquitous pentacene monolayer on metals deposited onto pentacene films.

    Science.gov (United States)

    Jaeckel, B; Sambur, J B; Parkinson, B A

    2007-11-01

    Photoelectron spectroscopy (XPS and UPS) was used to study the deposition of metal layers (Ag, Cu, and Au) onto pentacene films. Very low work functions were measured (PhiAg = 3.91 eV, PhiCu = 3.93 eV, and PhiAu = 4.3 eV) for all of the metals, in agreement with results from the literature. The intensities of the C 1s core-level signals from pentacene that were monitored during stepwise metal deposition leveled off at a value of about 30% of a thick pentacene film. This C 1s intensity is comparable to that of one monolayer of pentacene deposited onto the respective metal. The valence band spectra of metals deposited onto pentacene and spectra collected for pentacene deposited onto bare metal surfaces are very similar. These findings lead to the conclusion that approximately one monolayer of pentacene is always present on top of the freshly deposited metal film, which explains the very low work function of the metals when they are deposited onto organic films. We expect similar behavior with other nonreactive metals deposited onto stable organic layers.

  16. Stoichiometry controlled oxide thin film growth by pulsed laser deposition

    NARCIS (Netherlands)

    Groenen, Rik; Smit, Jasper; Orsel, Kasper; Vailionis, Arturas; Bastiaens, Bert; Huijben, Mark; Boller, Klaus; Rijnders, Guus; Koster, Gertjan

    2015-01-01

    The oxidation of species in the plasma plume during pulsed laser deposition controls both the stoichiometry as well as the growth kinetics of the deposited SrTiO3 thin films, instead of the commonly assumed mass distribution in the plasma plume and the kinetic energy of the arriving species. It was

  17. Vacuum deposition of stoichiometric crystalline PbS films: The effect of sulfurizing environment during deposition

    Science.gov (United States)

    Singh, B. P.; Kumar, R.; Kumar, A.; Tyagi, R. C.

    2015-10-01

    Thin film of lead sulfide (PbS) was deposited onto highly cleaned glass and quartz substrates using a vacuum thermal evaporation technique. The effect of the sulfurizing environment on the growth and properties of vacuum-deposited PbS thin film was studied. The ambient sulfurizing environment was created by thermal decomposition of thiourea inside the vacuum chamber during deposition to maintain the stoichiometry and quality of the PbS film. The sulfurizing gas H2S, produced in the thermal decomposition of the solid sulfur containing thiourea readily combines with the cations (Pb2+) without leaving any anions (S2-) at the substrates and also has not produced any excess of sulfur at the substrates. The deposited film was characterized by optical spectroscopy, x-ray diffraction patterns, scanning electron micrographs with energy dispersive analysis of x-rays, and atomic force micrographs. The physical characterization of the deposited PbS film revealed that the surface of film grown in the sulfurizing environment improved and contained more stoichiometric sulfur in comparison to film deposited without the sulfurizing environment.

  18. Self-terminating growth of platinum films by electrochemical deposition.

    Science.gov (United States)

    Liu, Yihua; Gokcen, Dincer; Bertocci, Ugo; Moffat, Thomas P

    2012-12-07

    A self-terminating rapid electrodeposition process for controlled growth of platinum (Pt) monolayer films from a K(2)PtCl(4)-NaCl electrolyte has been developed that is tantamount to wet atomic layer deposition. Despite the deposition overpotential being in excess of 1 volt, Pt deposition was quenched at potentials just negative of proton reduction by an alteration of the double-layer structure induced by a saturated surface coverage of underpotential deposited H (H(upd)). The surface was reactivated for further Pt deposition by stepping the potential to more positive values, where H(upd) is oxidized and fresh sites for the adsorption of PtCl(4)(2-) become available. Periodic pulsing of the potential enables sequential deposition of two-dimensional Pt layers to fabricate films of desired thickness, relevant to a range of advanced technologies.

  19. Thin-film organic photonics molecular layer deposition and applications

    CERN Document Server

    Yoshimura, Tetsuzo

    2011-01-01

    Among the many atomic/molecular assembling techniques used to develop artificial materials, molecular layer deposition (MLD) continues to receive special attention as the next-generation growth technique for organic thin-film materials used in photonics and electronics. Thin-Film Organic Photonics: Molecular Layer Deposition and Applications describes how photonic/electronic properties of thin films can be improved through MLD, which enables precise control of atomic and molecular arrangements to construct a wire network that achieves ""three-dimensional growth"". MLD facilitates dot-by-dot--o

  20. Chemical vapor deposition reactor. [providing uniform film thickness

    Science.gov (United States)

    Chern, S. S.; Maserjian, J. (Inventor)

    1977-01-01

    An improved chemical vapor deposition reactor is characterized by a vapor deposition chamber configured to substantially eliminate non-uniformities in films deposited on substrates by control of gas flow and removing gas phase reaction materials from the chamber. Uniformity in the thickness of films is produced by having reactive gases injected through multiple jets which are placed at uniformally distributed locations. Gas phase reaction materials are removed through an exhaust chimney which is positioned above the centrally located, heated pad or platform on which substrates are placed. A baffle is situated above the heated platform below the mouth of the chimney to prevent downdraft dispersion and scattering of gas phase reactant materials.

  1. Aluminosilicate glass thin films elaborated by pulsed laser deposition

    Science.gov (United States)

    Carlier, Thibault; Saitzek, Sébastien; Méar, François O.; Blach, Jean-François; Ferri, Anthony; Huvé, Marielle; Montagne, Lionel

    2017-03-01

    In the present work, we report the elaboration of aluminosilicate glass thin films by Pulsed Laser Deposition at various temperatures deposition. The amorphous nature of glass thin films was highlighted by Grazing Incidence X-Ray Diffraction and no nanocristallites were observed in the glassy matrix. Chemical analysis, obtained with X-ray Photoelectron Spectroscopy and Time of Flight Secondary Ion Mass Spectroscopy, showed a good transfer and homogeneous elementary distribution with of chemical species from the target to the film a. Structural studies performed by Infrared Spectroscopy showed that the substrate temperature plays an important role on the bonding configuration of the layers. A slight shift of Si-O modes to larger wavenumber was observed with the synthesis temperature, assigned to a more strained sub-oxide network. Finally, optical properties of thins film measured by Spectroscopic Ellipsometry are similar to those of the bulk aluminosilicate glass, which indicate a good deposition of aluminosilicate bulk glass.

  2. Aerosol deposition of (Cu,Ti) substituted bismuth vanadate films

    Energy Technology Data Exchange (ETDEWEB)

    Exner, Jörg, E-mail: Functional.Materials@Uni-Bayreuth.de [University of Bayreuth, Department of Functional Materials, Universitätsstraße 30, 95440 Bayreuth (Germany); Fuierer, Paul [Materials and Metallurgical Engineering Department, New Mexico Institute of Mining and Technology, Socorro, NM 87801 (United States); Moos, Ralf [University of Bayreuth, Department of Functional Materials, Universitätsstraße 30, 95440 Bayreuth (Germany)

    2014-12-31

    Bismuth vanadate, Bi{sub 4}V{sub 2}O{sub 11}, and related compounds with various metal (Me) substitutions, Bi{sub 4}(Me{sub x}V{sub 1−x}){sub 2}O{sub 11−δ}, show some of the highest ionic conductivities among the known solid oxide electrolytes. Films of Cu and Ti substituted bismuth vanadate were prepared by an aerosol deposition method, a spray coating process also described as room temperature impact consolidation. Resultant films, several microns in thickness, were dense with good adhesion to the substrate. Scanning electron microscopy and high temperature X-ray diffraction were used to monitor the effects of temperature on the structure and microstructure of the film. The particle size remained nano-scale while microstrain decreased rapidly up to 500 °C, above which coarsening and texturing increased rapidly. Impedance measurements of films deposited on inter-digital electrodes revealed an annealing effect on the ionic conductivity, with the conductivity exceeding that of a screen printed film, and approaching that of bulk ceramic. - Highlights: • Cu and Ti doped bismuth vanadate films were prepared by aerosol deposition (AD). • Dense 3–5 μm thick films were deposited on alumina, silicon and gold electrodes. • Annealing of the AD-layer increases the conductivity by 1.5 orders of magnitude. • Effect of temperature on structure and microstructure was investigated.

  3. Picosecond and subpicosecond pulsed laser deposition of Pb thin films

    Directory of Open Access Journals (Sweden)

    F. Gontad

    2013-09-01

    Full Text Available Pb thin films were deposited on Nb substrates by means of pulsed laser deposition (PLD with UV radiation (248 nm, in two different ablation regimes: picosecond (5 ps and subpicosecond (0.5 ps. Granular films with grain size on the micron scale have been obtained, with no evidence of large droplet formation. All films presented a polycrystalline character with preferential orientation along the (111 crystalline planes. A maximum quantum efficiency (QE of 7.3×10^{-5} (at 266 nm and 7 ns pulse duration was measured, after laser cleaning, demonstrating good photoemission performance for Pb thin films deposited by ultrashort PLD. Moreover, Pb thin film photocathodes have maintained their QE for days, providing excellent chemical stability and durability. These results suggest that Pb thin films deposited on Nb by ultrashort PLD are a noteworthy alternative for the fabrication of photocathodes for superconductive radio-frequency electron guns. Finally, a comparison with the characteristics of Pb films prepared by ns PLD is illustrated and discussed.

  4. Deposition of antimony telluride thin film by ECALE

    Institute of Scientific and Technical Information of China (English)

    GAO; Xianhui; YANG; Junyou; ZHU; Wen; HOU; Jie; BAO; Siqian; FAN; Xi'an; DUAN; Xingkai

    2006-01-01

    The process of Sb2Te3 thin film growth on the Pt substrate by electrochemical atomic layer epitaxy (ECALE) was studied. Cyclic voltammetric scanning was performed to analyze the electrochemical behavior of Te and Sb on the Pt substrate. Sb2Te3 film was formed using an automated flow deposition system by alternately depositing Te and Sb atomic layers for 400 circles. The deposited Sb2Te3 films were characterized by XRD, EDX, FTIR and FESEM observation. Sb2Te3 compound structure was confirmed by XRD pattern and agreed well with the results of EDX quantitative analysis and coulometric analysis. FESEM micrographs showed that the deposit was composed of fine nano particles with size of about 20 nm. FESEM image of the cross section showed that the deposited films were very smooth and dense with thickness of about 190 nm. The optical band gap of the deposited Sb2Te3 film was determined as 0.42 eV by FTIR spectroscopy, and it was blue shifted in comparison with that of the bulk Sb2Te3 single crystal due to its nanocrystalline microstructure.

  5. UV laser deposition of metal films by photogenerated free radicals

    Science.gov (United States)

    Montgomery, R. K.; Mantei, T. D.

    1986-01-01

    A novel photochemical method for liquid-phase deposition of metal films is described. In the liquid phase deposition scheme, a metal containing compound and a metal-metal bonded carbonyl complex are dissolved together in a polar solvent and the mixture is irradiated using a UV laser. The optical arrangement consists of a HeCd laser which provides 7 mW of power at a wavelength of 325 nm in the TEM(OO) mode. The beam is attenuated and may be expanded to a diameter of 5-20 mm. Experiments with photochemical deposition of silver films onto glass and quartz substrates are described in detail. Mass spectrometric analysis of deposited silver films indicated a deposition rate of about 1 A/s at incident power levels of 0.01 W/sq cm. UV laser-induced copper and palladium films have also been obtained. A black and white photograph showing the silver Van Der Pauw pattern of a solution-deposited film is provided.

  6. Microreactor-Assisted Solution Deposition for Compound Semiconductor Thin Films

    Directory of Open Access Journals (Sweden)

    Chang-Ho Choi

    2014-05-01

    Full Text Available State-of-the-art techniques for the fabrication of compound semiconductors are mostly vacuum-based physical vapor or chemical vapor deposition processes. These vacuum-based techniques typically operate at high temperatures and normally require higher capital costs. Solution-based techniques offer opportunities to fabricate compound semiconductors at lower temperatures and lower capital costs. Among many solution-based deposition processes, chemical bath deposition is an attractive technique for depositing semiconductor films, owing to its low temperature, low cost and large area deposition capability. Chemical bath deposition processes are mainly performed using batch reactors, where all reactants are fed into the reactor simultaneously and products are removed after the processing is finished. Consequently, reaction selectivity is difficult, which can lead to unwanted secondary reactions. Microreactor-assisted solution deposition processes can overcome this limitation by producing short-life molecular intermediates used for heterogeneous thin film synthesis and quenching the reaction prior to homogeneous reactions. In this paper, we present progress in the synthesis and deposition of semiconductor thin films with a focus on CdS using microreactor-assisted solution deposition and provide an overview of its prospect for scale-up.

  7. Sputter deposited Terfenol-D thin films for multiferroic applications

    Directory of Open Access Journals (Sweden)

    K. P. Mohanchandra

    2015-09-01

    Full Text Available In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011 cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10−6.

  8. Sputter deposited Terfenol-D thin films for multiferroic applications

    Science.gov (United States)

    Mohanchandra, K. P.; Prikhodko, S. V.; Wetzlar, K. P.; Sun, W. Y.; Nordeen, P.; Carman, G. P.

    2015-09-01

    In this paper, we study the sputter deposition and crystallization process to produce high quality Terfenol-D thin film (100 nm) with surface roughness below 1.5 nm. The Terfenol-D thin film was produced using DC magnetron sputtering technique with various sputtering parameters and two different crystallization methods, i.e. substrate heating and post-annealing. Several characterization techniques including WDS, XRD, TEM, AFM, SQUID and MOKE were used to determine the physical and magnetic properties of the Terfenol-D films. TEM studies reveal that the film deposited on the heated substrate has large grains grown along the film thickness producing undesirable surface roughness while the film crystallized by post-annealing method shows uniformly distributed small grains producing a smooth surface. The Terfenol-D film was also deposited onto (011) cut PMN-PT single crystal substrate. With the application of an electric field the film exhibited a 1553 Oe change in coercivity with an estimated saturation magnetostriction of λs = 910 x 10-6.

  9. High-quality AlN films grown on chemical vapor-deposited graphene films

    Directory of Open Access Journals (Sweden)

    Chen Bin-Hao

    2016-01-01

    Full Text Available We report the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were deposited by DC magnetron sputtering on both graphene as an intermediate layer and silicon as a substrate. The structural characteristics of the AlN films and graphene were investigated. Highly c-axis-oriented AlN crystal structures are investigated based on the XRDpatterns observations.

  10. Large-Scale Graphene Film Deposition for Monolithic Device Fabrication

    Science.gov (United States)

    Al-shurman, Khaled

    Since 1958, the concept of integrated circuit (IC) has achieved great technological developments and helped in shrinking electronic devices. Nowadays, an IC consists of more than a million of compacted transistors. The majority of current ICs use silicon as a semiconductor material. According to Moore's law, the number of transistors built-in on a microchip can be double every two years. However, silicon device manufacturing reaches its physical limits. To explain, there is a new trend to shrinking circuitry to seven nanometers where a lot of unknown quantum effects such as tunneling effect can not be controlled. Hence, there is an urgent need for a new platform material to replace Si. Graphene is considered a promising material with enormous potential applications in many electronic and optoelectronics devices due to its superior properties. There are several techniques to produce graphene films. Among these techniques, chemical vapor deposition (CVD) offers a very convenient method to fabricate films for large-scale graphene films. Though CVD method is suitable for large area growth of graphene, the need for transferring a graphene film to silicon-based substrates is required. Furthermore, the graphene films thus achieved are, in fact, not single crystalline. Also, graphene fabrication utilizing Cu and Ni at high growth temperature contaminates the substrate that holds Si CMOS circuitry and CVD chamber as well. So, lowering the deposition temperature is another technological milestone for the successful adoption of graphene in integrated circuits fabrication. In this research, direct large-scale graphene film fabrication on silicon based platform (i.e. SiO2 and Si3N4) at low temperature was achieved. With a focus on low-temperature graphene growth, hot-filament chemical vapor deposition (HF-CVD) was utilized to synthesize graphene film using 200 nm thick nickel film. Raman spectroscopy was utilized to examine graphene formation on the bottom side of the Ni film

  11. Defect control in room temperature deposited cadmium sulfide thin films by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hernandez-Como, N. [Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States); Martinez-Landeros, V. [Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States); Centro de Investigación en Materiales Avanzados, Monterrey, Nuevo Leon, 66600, México (Mexico); Mejia, I. [Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States); Aguirre-Tostado, F.S. [Centro de Investigación en Materiales Avanzados, Monterrey, Nuevo Leon, 66600, México (Mexico); Nascimento, C.D.; Azevedo, G. de M; Krug, C. [Instituto de Física, Universidade Federal do Rio Grande do Sul, Porto Alegre, 91509-900 (Brazil); Quevedo-Lopez, M.A., E-mail: mquevedo@utdallas.edu [Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States)

    2014-01-01

    The control of defects in cadmium sulfide thin films and its impact on the resulting CdS optical and electrical characteristics are studied. Sulfur vacancies and cadmium interstitial concentrations in the CdS films are controlled using the ambient pressure during pulsed laser deposition. CdS film resistivities ranging from 10{sup −1} to 10{sup 4} Ω-cm are achieved. Hall Effect measurements show that the carrier concentration ranges from 10{sup 19} to 10{sup 13} cm{sup −3} and is responsible for the observed resistivity variation. Hall mobility varies from 2 to 12 cm{sup 2}/V-s for the same pressure regime. Although the energy bandgap remains unaffected (∼ 2.42 eV), the optical transmittance is reduced due to the increase of defects in the CdS films. Rutherford back scattering spectroscopy shows the dependence of the CdS films stoichiometry with deposition pressure. The presence of CdS defects is attributed to more energetic species reaching the substrate, inducing surface damage in the CdS films during pulsed laser deposition. - Highlights: • CdS thin films deposited by pulsed laser deposition at room temperature. • The optical, electrical and structural properties were evaluated. • Carrier concentration ranged from 10{sup 19} to 10{sup 13} cm{sup −3}. • The chemical composition was studied by Rutherford back scattering. • The density of sulfur vacancies and cadmium interstitial was varied.

  12. Growth of tantalum pentoxide film by pulsed laser deposition

    Science.gov (United States)

    Zhang, Jun-Ying; Fang, Qi; Boyd, Ian W.

    1999-01-01

    Thin films of Ta 2O 5 have been deposited on quartz and silicon substrates by 532-nm (Nd:YAG) pulsed laser deposition (PLD) in various O 2 gas environments. The influence of the deposition parameters, such as oxygen pressure, substrate temperature and annealing under UV irradiation using a 172-nm excimer lamp, on the properties of the grown films, has been studied. The refractive index of the films increases with increasing pressure of O 2. X-ray diffraction measurements show that the as-deposited films are amorphous at temperatures below 500°C and possess orthorhombic (β-Ta 2O 5) crystal structure at temperatures above 600°C. The optical properties determined by UV spectrophotometry also strongly depend on the deposition parameters. At O 2 pressures above 0.15 mbar, the refractive index of the films was about 2.12 which is close to the bulk Ta 2O 5 value of 2.2. Optical transmittance around 85% in the visible region of the spectrum was obtained at an oxygen pressure of 0.2 mbar.

  13. Pulsed laser deposition of niobium nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Farha, Ashraf Hassan, E-mail: ahass006@odu.edu; Elsayed-Ali, Hani E., E-mail: helsayed@odu.edu [Department of Electrical and Computer Engineering, Old Dominion University, Norfolk, VA 23529 (United States); Applied Research Center, Jefferson National Accelerator Facility, Newport News, VA 23606 (United States); Department of Physics, Faculty of Science, Ain Shams University, Cairo 11566 (Egypt); Ufuktepe, Yüksel, E-mail: ufuk@cu.edu.tr [Department of Physics, University of Cukurova, 01330 Adana (Turkey); Myneni, Ganapati, E-mail: rao@jlab.org [Thomas Jefferson National Accelerator Facility, Newport News, Virginia 23606 (United States)

    2015-12-04

    Niobium nitride (NbN{sub x}) films were grown on Nb and Si(100) substrates using pulsed laser deposition. NbN{sub x} films were deposited on Nb substrates using PLD with a Q-switched Nd:YAG laser (λ = 1064 nm, ∼40 ns pulse width, and 10 Hz repetition rate) at different laser fluences, nitrogen background pressures and deposition substrate temperatures. When all the fabrication parameters are fixed, except for the laser fluence, the surface roughness, nitrogen content, and grain size increase with increasing laser fluence. Increasing nitrogen background pressure leads to a change in the phase structure of the NbN{sub x} films from mixed β-Nb{sub 2}N and cubic δ-NbN phases to single hexagonal β-Nb{sub 2}N. The substrate temperature affects the preferred orientation of the crystal structure. The structural and electronic, properties of NbN{sub x} deposited on Si(100) were also investigated. The NbN{sub x} films exhibited a cubic δ-NbN with a strong (111) orientation. A correlation between surface morphology, electronic, and superconducting properties was found. The observations establish guidelines for adjusting the deposition parameters to achieve the desired NbN{sub x} film morphology and phase.

  14. Epitaxial yttrium iron garnet films grown by pulsed laser deposition

    Science.gov (United States)

    Dorsey, P. C.; Bushnell, S. E.; Seed, R. G.; Vittoria, C.

    1993-07-01

    Epitaxial Y3Fe5O12 (YIG) films have been grown by the pulsed laser deposition (PLD) technique on (111) gadolinium gallium garnet substrates. The effect of substrate temperature and oxygen partial pressure on the structure, composition, and magnetic properties of the films was investigated and compared to liquid phase epitaxy YIG films. The results demonstrated that epitaxial YIG films could be prepared under a wide range of deposition conditions, but narrow linewidth (ΔH≂1 Oe) films were producible only at low oxygen partial pressures (O2temperatures (Ts≳800 °C). Since the linewidth of single-crystal YIG is dominated by surface and volume defects and/or impurities, the narrow linewidth indicated that PLD is a viable technique for producing high-quality ferrite films for microwave device applications. In addition, under all deposition conditions (50-1000 mTorr and 700-850 °C) there is a uniaxial axis perpendicular to the film plane. However, at low oxygen pressure the uniaxial anisotropy energy constant Ku is negative while at high oxygen pressure Ku is positive.

  15. CdS films deposited by chemical bath under rotation

    Energy Technology Data Exchange (ETDEWEB)

    Oliva-Aviles, A.I., E-mail: aoliva@mda.cinvestav.mx [Centro de Investigacion y de Estudios Avanzados Unidad Merida, Departamento de Fisica Aplicada. A.P. 73-Cordemex, 97310 Merida, Yucatan (Mexico); Patino, R.; Oliva, A.I. [Centro de Investigacion y de Estudios Avanzados Unidad Merida, Departamento de Fisica Aplicada. A.P. 73-Cordemex, 97310 Merida, Yucatan (Mexico)

    2010-08-01

    Cadmium sulfide (CdS) films were deposited on rotating substrates by the chemical bath technique. The effects of the rotation speed on the morphological, optical, and structural properties of the films were discussed. A rotating substrate-holder was fabricated such that substrates can be taken out from the bath during the deposition. CdS films were deposited at different deposition times (10, 20, 30, 40 and 50 min) onto Corning glass substrates at different rotation velocities (150, 300, 450, and 600 rpm) during chemical deposition. The chemical bath was composed by CdCl{sub 2}, KOH, NH{sub 4}NO{sub 3} and CS(NH{sub 2}){sub 2} as chemical reagents and heated at 75 deg. C. The results show no critical effects on the band gap energy and the surface roughness of the CdS films when the rotation speed changes. However, a linear increase on the deposition rate with the rotation energy was observed, meanwhile the stoichiometry was strongly affected by the rotation speed, resulting a better 1:1 Cd/S ratio as speed increases. Rotation effects may be of interest in industrial production of CdTe/CdS solar cells.

  16. Control of crystallite size in diamond film chemical vapor deposition

    Science.gov (United States)

    Moran, Mark B.; Johnson, Linda F.; Klemm, Karl A.

    1992-12-01

    In depositing an adhering, continuous, polycrystalline diamond film of optical or semiconductor quality on a substrate, as by forming on the substrate a layer of a refractory nitride interlayer and depositing diamond on the interlayer without mechanical treatment or seeding of the substrate or the interlayer, the substrate is heated in a vacuum chamber containing a microwave activated mixture of hydrogen and a gas including carbon, and the size of deposited diamond crystallites and their rate of deposition selectively varied by a bias voltage applied to the substrate.

  17. Characterization of CdTe Films Deposited at Various Bath Temperatures and Concentrations Using Electrophoretic Deposition

    OpenAIRE

    Zulkarnain Zainal; Mohd Norizam Md Daud; Azmi Zakaria; Mohd Sabri Mohd Ghazali; Atefeh Jafari; Wan Rafizah Wan Abdullah

    2012-01-01

    CdTe film was deposited using the electrophoretic deposition technique onto an ITO glass at various bath temperatures. Four batch film compositions were used by mixing 1 to 4 wt% concentration of CdTe powder with 10 mL of a solution of methanol and toluene. X-ray Diffraction analysis showed that the films exhibited polycrystalline nature of zinc-blende structure with the (111) orientation as the most prominent peak. From the Atomic Force Microscopy, the thickness and surface roughness of the ...

  18. Deposition of Cadmium Sulphide Thin Films by Photochemical Deposition and Characterization

    Directory of Open Access Journals (Sweden)

    H.L. Pushpalatha

    2015-03-01

    Full Text Available Deposition of cadmium sulphide (CdS thin films on glass substrates in acidic medium by photochemical deposition (PCD and studies by several characterizations are presented. The structural characterization of the thin films was carried out by XRD. The elemental composition of the thin films was carried out by EDAX. The optical properties have been studied in the wavelength range 200-900 nm and the optical transition has been found to be direct and allowed. The morphological properties are studied by AFM and electrical properties are studied by four probe technique.

  19. Properties of N-rich Silicon Nitride Film Deposited by Plasma-Enhanced Atomic Layer Deposition

    Science.gov (United States)

    Jhang, Pei-Ci; Lu, Chi-Pin; Shieh, Jung-Yu; Yang, Ling-Wu; Yang, Tahone; Chen, Kuang-Chao; Lu, Chih-Yuan

    2017-07-01

    An N-rich silicon nitride film, with a lower refractive index (RI) than the stoichiometric silicon nitride (RI = 2.01), was deposited by alternating the exposure of dichlorosilane (DCS, SiH2Cl2) and that of ammonia (NH3) in a plasma-enhanced atomic layer deposition (PEALD) process. In this process, the plasma ammonia was easily decomposed to reactive radicals by RF power activating so that the N-rich silicon nitride was easily formed by excited ammonia radicals. The growth kinetics of N-rich silicon nitride were examined at various deposition temperatures ranging from 400 °C to 630 °C; the activation energy (Ea) decreased as the deposition temperature decreased below 550 °C. N-rich silicon nitride film with a wide range of values of refractive index (RI) (RI = 1.86-2.00) was obtained by regulating the deposition temperature. At the optimal deposition temperature, the effects of RF power, NH3 flow rate and NH3 flow time were on the characteristics of the N-rich silicon nitride film were evaluated. The results thus reveal that the properties of the N-rich silicon nitride film that was formed by under plasma-enhanced atomic layer deposition (PEALD) are dominated by deposition temperature. In charge trap flash (CTF) study, an N-rich silicon nitride film was applied to MAONOS device as a charge-trapping layer. The films exhibit excellent electron trapping ability and favor a fresh cell data retention performance as the deposition temperature decreased.

  20. Aspects of thin film deposition on granulates by physical vapor deposition

    Science.gov (United States)

    Eder, Andreas; Schmid, Gerwin H. S.; Mahr, Harald; Eisenmenger-Sittner, Christoph

    2016-11-01

    Thin film and coating technology has entered fields which may show significant deviations from classical coating applications where films are deposited on plane, sometimes large substrates. Often surfaces of small and irregularly shaped bodies have to be improved in respect to electrical, thermal or mechanical properties. Film deposition and characterization on such small substrates is not a trivial task. This specially holds for methods based on Physical Vapor Deposition (PVD) processes such as sputter deposition and its ion- and plasma assisted varieties. Due to their line of sight nature a key issue for homogenous films is efficient intermixing. If this problem is mastered, another task is the prediction and determination of the film thickness on single particles as well as on large scale ensembles thereof. In this work a mechanism capable of uniformly coating up to 1000 cm3 of granulate with particle sizes ranging from approx. 10 μm to 150 μm by magnetron sputtering is thoroughly described. A method for predicting the average film thickness on the particles is presented and tested for several differently shaped objects like microspheres, irregular grains of sinter powder or micro diamonds. For assessing the film thickness on single particles as well as on particle ensembles several complementary methods based on optics, X-ray analysis and gravimetry are employed. Their respective merits and limitations are discussed. Finally an outlook on adapting the described technology for surface modification by plasma based reactive and non-reactive processes is given.

  1. Deposition of Cu seed layer film by supercritical fluid deposition for advanced interconnects

    Institute of Scientific and Technical Information of China (English)

    Zhao Bin; Zhao Ming-Tao; Zhang Yan-Fei; Yang Jun-He

    2013-01-01

    The deposition of a Cu seed layer film is investigated by supercritical fluid deposition (SCFD) using H2 as a reducing agent for Bis(2,2,6,6-tetramethyl-3,5-heptanedionato) copper in supercritical CO2 (scCO2).The effects of deposition temperature,precursor,and H2 concentration are investigated to optimize Cu deposition.Continuous metallic Cu films are deposited on Ru substrates at 190 ℃ when a 0.002 mol/L Cu precursor is introduced with 0.75 mol/L H2.A Cu precursor concentration higher than 0.002 mol/L is found to have negative effects on the surface qualities of Cu films.For a H2concentration above 0.56 mol/L,the root-mean-square (RMS) roughness of a Cu film decreases as the H2 concentration increases.Finally,a 20-nm thick Cu film with a smooth surface,which is required as a seed layer in advanced interconnects,is successfully deposited at a high H2 concentration (0.75 mol/L).

  2. Plasma deposited fluorinated films on porous membranes

    Energy Technology Data Exchange (ETDEWEB)

    Gancarz, Irena [Department of Polymer and Carbon Materials, Wrocław University of Technology, 50-370 Wrocław (Poland); Bryjak, Marek, E-mail: marek.bryjak@pwr.edu.pl [Department of Polymer and Carbon Materials, Wrocław University of Technology, 50-370 Wrocław (Poland); Kujawski, Jan; Wolska, Joanna [Department of Polymer and Carbon Materials, Wrocław University of Technology, 50-370 Wrocław (Poland); Kujawa, Joanna; Kujawski, Wojciech [Nicolaus Copernicus University, Faculty of Chemistry, 7 Gagarina St., 87-100 Torun (Poland)

    2015-02-01

    75 KHz plasma was used to modify track etched poly(ethylene terephthalate) membranes and deposit on them flouropolymers. Two fluorine bearing monomers were used: perflourohexane and hexafluorobenzene. The modified surfaces were analyzed by means of attenuated total reflection infra-red spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy and wettability. It was detected that hexaflourobenxene deposited to the larger extent than perflourohaxane did. The roughness of surfaces decreased when more fluoropolymer was deposited. The hydrophobic character of surface slightly disappeared during 20-days storage of hexaflourobenzene modified membrane. Perfluorohexane modified membrane did not change its character within 120 days after modification. It was expected that this phenomenon resulted from post-reactions of oxygen with radicals in polymer deposits. The obtained membranes could be used for membrane distillation of juices. - Highlights: • Plasma deposited hydrophobic layer of flouropolymers. • Deposition degree affects the surface properties. • Hydrohilization of surface due to reaction of oxygen with entrapped radicals. • Possibility to use modified porous membrane for water distillation and apple juice concentration.

  3. Ultraviolet laser deposition of graphene thin films without catalytic layers

    KAUST Repository

    Sarath Kumar, S. R.

    2013-01-09

    In this letter, the formation of nanostructured graphene by ultraviolet laser ablation of a highly ordered pyrolytic graphite target under optimized conditions is demonstrated, without a catalytic layer, and a model for the growth process is proposed. Previously, graphene film deposition by low-energy laser (2.3 eV) was explained by photo-thermal models, which implied that graphene films cannot be deposited by laser energies higher than the C-C bond energy in highly ordered pyrolytic graphite (3.7 eV). Here, we show that nanostructured graphene films can in fact be deposited using ultraviolet laser (5 eV) directly over different substrates, without a catalytic layer. The formation of graphene is explained by bond-breaking assisted by photoelectronic excitation leading to formation of carbon clusters at the target and annealing out of defects at the substrate.

  4. Shallow bath chemical deposition of CdS thin film

    Energy Technology Data Exchange (ETDEWEB)

    Lo, Y.S. [Department of Molecule Science and Engineering, National Taipei University of Science and Technology, Taipei, 10617, Taiwan (China); Choubey, R.K. [Department of Applied Physics, Birla Institute of Technology, Mesra, Ranchi, 835 215 (India); Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan (China); Yu, W.C. [Department of Molecule Science and Engineering, National Taipei University of Science and Technology, Taipei, 10617, Taiwan (China); Hsu, W.T. [Green Energy and Environmental Research Laboratory, Industrial Technology Research Institute, Hsin-Chu, Taiwan (China); Lan, C.W., E-mail: cwlan@ntu.edu.tw [Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan (China)

    2011-10-31

    Cadmium sulfide thin film was grown by shallow chemical bath deposition technique. This technique used a highly conducted hot plate to heat the substrate, while using a shallow bath for higher thermal gradients. As a result, large area uniformity could be achieved and the homogeneous nucleation was suppressed. More importantly, the solution used was greatly reduced, which is crucial for cost reduction in practice. The effects of temperature and shaking on the growth kinetics and film properties were investigated. The reaction activation energy was obtained to be 0.84 eV, and was not affected much by shaking indicating that the deposition is essentially reaction controlled. Furthermore, the films deposited at low or high temperature conditions had better photoconductivity.

  5. Cobalt Xanthate Thin Film with Chemical Bath Deposition

    Directory of Open Access Journals (Sweden)

    İ. A. Kariper

    2013-01-01

    Full Text Available Cobalt xanthate thin films (CXTFs were successfully deposited by chemical bath deposition, onto amorphous glass substrates, as well as on p- and n-silicon, indium tin oxide, and poly(methyl methacrylate. The structure of the films was analyzed by far-infrared spectrum (FIR, mid-infrared (MIR spectrum, nuclear magnetic resonance (NMR, and scanning electron microscopy (SEM. These films were investigated from their structural, optical, and electrical properties point of view. Electrical properties were measured using four-point method, whereas optical properties were investigated via UV-VIS spectroscopic technique. Uniform distribution of grains was clearly observed from the photographs taken by scanning electron microscope (SEM. The transmittance was about 70–80% (4 hours, 50°C. The optical band gap of the CXTF was graphically estimated to be 3.99–4.02 eV. The resistivity of the films was calculated as 22.47–75.91 Ω·cm on commercial glass depending on film thickness and 44.90–73.10 Ω ·cm on the other substrates. It has been observed that the relative resistivity changed with film thickness. The MIR and FIR spectra of the films were in agreement with the literature analogues. The expected peaks of cobalt xanthate were observed in NMR analysis on glass. The films were dipped in chloroform as organic solvent and were analyzed by NMR.

  6. Electron-beam deposition of vanadium dioxide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Marvel, R.E.; Appavoo, K. [Vanderbilt University, Interdisciplinary Materials Science Program, Nashville, TN (United States); Choi, B.K. [Vanderbilt University, Department of Electrical Engineering and Computer Science, Nashville, TN (United States); Nag, J. [Vanderbilt University, Department of Physics and Astronomy, Nashville, TN (United States); Haglund, R.F. [Vanderbilt University, Interdisciplinary Materials Science Program, Nashville, TN (United States); Vanderbilt University, Institute for Nanoscale Science and Engineering, Nashville, TN (United States); Vanderbilt University, Department of Physics and Astronomy, Nashville, TN (United States)

    2013-06-15

    Developing a reliable and efficient fabrication method for phase-transition thin-film technology is critical for electronic and photonic applications. We demonstrate a novel method for fabricating polycrystalline, switchable vanadium dioxide thin films on glass and silicon substrates and show that the optical switching contrast is not strongly affected by post-processing annealing times. The method relies on electron-beam evaporation of a nominally stoichiometric powder, followed by fast annealing. As a result of the short annealing procedure we demonstrate that films deposited on silicon substrates appear to be smoother, in comparison to pulsed laser deposition and sputtering. However, optical performance of e-beam evaporated film on silicon is affected by annealing time, in contrast to glass. (orig.)

  7. Microwave annealing effects on ZnO films deposited by atomic layer deposition

    Institute of Scientific and Technical Information of China (English)

    Zhao Shirui; Dong Yabin; Yu Mingyan; Guo Xiaolong; Xu Xinwei; Jing Yupeng; Xia Yang

    2014-01-01

    Zinc oxide thin films deposited on glass substrate at 150 ℃ by atomic layer deposition were annealed by the microwave method at temperatures below 500 ℃.The microwave annealing effects on the structural and luminescent properties of ZnO films have been investigated by X-ray diffraction and photoluminescence.The results show that the MWA process can increase the crystal quality of ZnO thin films with a lower annealing temperature than RTA and relatively decrease the green luminescence of ZnO films.The observed changes have demonstrated that MWA is a viable technique for improving the crystalline quality of ZnO thin film on glass.

  8. Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    YAO Kailun; ZHENG Jianwan; LIU Zuli; JIA Lihui

    2007-01-01

    In this paper,the characterization of thin films,deposited with the precursor ferrocene(FcH)by the plasma enhanced chemical vapour deposition(PECVD)technique,was investigated.The films were measured by Scanning Electronic Microscopy(SEM),Atomic Force Microscopy(AFM),Electron Spectroscopy for Chemical Analysis(ESCA),and superconducting Quantum Interference Device(SQUID).It was observed that the film's layer is homogeneous in thickness and has a dense morphology without cracks.The surface roughness is about 36 nm.From the results of ESCA,it can be inferred that the film mainly contains the compound FeOOH,and carbon is combined with oxygen in different forms under different supply-powers.The hysteresis loops indicate that the film is of soft magnetism.

  9. Stress control of silicon nitride films deposited by plasma enhanced chemical vapor deposition

    Science.gov (United States)

    Li, Dong-ling; Feng, Xiao-fei; Wen, Zhi-yu; Shang, Zheng-guo; She, Yin

    2016-07-01

    Stress controllable silicon nitride (SiNx) films deposited by plasma enhanced chemical vapor deposition (PECVD) are reported. Low stress SiNx films were deposited in both high frequency (HF) mode and dual frequency (HF/LF) mode. By optimizing process parameters, stress free (-0.27 MPa) SiNx films were obtained with the deposition rate of 45.5 nm/min and the refractive index of 2.06. Furthermore, at HF/LF mode, the stress is significantly influenced by LF ratio and LF power, and can be controlled to be 10 MPa with the LF ratio of 17% and LF power of 150 W. However, LF power has a little effect on the deposition rate due to the interaction between HF power and LF power. The deposited SiNx films have good mechanical and optical properties, low deposition temperature and controllable stress, and can be widely used in integrated circuit (IC), micro-electro-mechanical systems (MEMS) and bio-MEMS.

  10. Glancing angle deposition of thin films engineering the nanoscale

    CERN Document Server

    Hawkeye, Matthew M; Brett, Michael J

    2014-01-01

    This book provides a highly practical treatment of GLAD technology, gathering existing procedures, methodologies, and experimental designs into a single, cohesive volume which will be useful both as a ready reference for those in the field and as a definitive guide for those entering it. It covers: History and development of GLAD techniquesProperties and Characterization of GLAD fabricated filmsDesign and engineering of optical GLAD films including fabrication and testingPost-deposition processing and integrationDeposition systems for GLAD fabrication Also includes a patent survey of relevant literature and a survey of GLAD's wide range of material properties and diverse applications.

  11. Spray pyrolysis deposition of indium sulphide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Otto, K.; Katerski, A.; Mere, A.; Volobujeva, O.; Krunks, M., E-mail: malle@staff.ttu.e

    2011-03-01

    In{sub 2}S{sub 3} thin films were grown by the chemical spray pyrolysis (CSP) method using the pneumatic spray set-up and compressed air as a carrier gas. Aqueous solutions containing InCl{sub 3} and SC(NH{sub 2}){sub 2} at a molar ratio of In/S = 1/3 and 1/6 were deposited onto preheated glass sheets at substrate temperatures T{sub s} = 205-410 {sup o}C. The obtained films were characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM,) optical transmission spectra, X-ray photoelectron spectroscopy (XPS) and energy dispersive spectroscopy (EDS). According to XRD, thin films deposited at T{sub s} = 205-365 {sup o}C were composed of the (0 0 12) orientated tetragonal {beta}-In{sub 2}S{sub 3} phase independent of the In/S ratio in the spray solution. Depositions performed at T{sub s} = 410 {sup o}C led to the formation of the In{sub 2}O{sub 3} phase, preferably when the 1/3 solution was sprayed. Post-deposition annealing in air indicated that oxidation of the sulphide phase has a minor role in the formation of In{sub 2}O{sub 3} at temperatures up to 450 {sup o}C. In{sub 2}S{sub 3} films grown at T{sub s} below 365 {sup o}C exhibited transparency over 70% in the visible spectral region and E{sub g} of 2.90-2.96 eV for direct and 2.15-2.30 eV for indirect transitions, respectively. Film thickness and chlorine content decreased with increasing deposition temperatures. The XPS study revealed that the In/S ratio in the spray solution had a significant influence on the content of oxygen (Me-O, BE = 530.0 eV) in the In{sub 2}S{sub 3} films deposited in the temperature range of 205-365 {sup o}C. Both XPS and EDS studies confirmed that oxygen content in the films deposited using the solution with the In/S ratio of 1/6 was substantially lower than in the films deposited with the In/S ratio of 1/3.

  12. Study of indium tin oxide thin films deposited on acrylics substrates by Ion beam assisted deposition technique

    OpenAIRE

    Meng Lijian; Liang Erjun; Gao Jinsong; Teixeira, Vasco M. P.; Santos, M. P. dos

    2009-01-01

    Indium tin oxide (ITO) thin films have been deposited onto acrylics (PMMA) substrates by ion beam assisted deposition technique at different oxygen flows. The structural, optical and electrical properties of the deposited films have been characterized by X-ray diffraction, transmittance, FTIR, ellipometry and Hall effect measurements. The optical constants of the deposited films have been calculated by fitting the ellipsometric spectra. The effects of the oxygen flow on the properties of the ...

  13. Fabrication and characterization of vacuum deposited fluorescein thin films

    Energy Technology Data Exchange (ETDEWEB)

    Jalkanen, Pasi, E-mail: pasi.jalkanen@gmail.co [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Kulju, Sampo, E-mail: sampo.j.kulju@jyu.f [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Arutyunov, Konstantin, E-mail: konstantin.arutyunov@jyu.f [University of Jyvaeskylae, Department of Physics, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Antila, Liisa, E-mail: liisa.j.antila@jyu.f [University of Jyvaeskylae, Department of Chemistry, Nanoscience center (NSC) P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Myllyperkioe, Pasi, E-mail: pasi.myllyperkio@jyu.f [University of Jyvaeskylae, Department of Chemistry, Nanoscience center (NSC) P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Ihalainen, Teemu, E-mail: teemu.o.ihalainen@jyu.f [University of Jyvaeskylae, Department of Biology, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland); Kaeaeriaeinen, Tommi, E-mail: tommi.kaariainen@lut.f [Lappeenranta University of Technology, ASTRal, P.O. Box 181, FI-50101 Mikkeli (Finland); Kaeaeriaeinen, Marja-Leena, E-mail: marja-leena.kaariainen@lut.f [Lappeenranta University of Technology, ASTRal, P.O. Box 181, FI-50101 Mikkeli (Finland); Korppi-Tommola, Jouko, E-mail: jouko.korppi-tommola@jyu.f [University of Jyvaeskylae, Department of Biology, Nanoscience center (NSC), P.O. Box 35, FI-40014 Jyvaeskylae (Finland)

    2011-03-31

    Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, fluorine-tin-oxide (FTO) coated glass with and without atomically layer deposited (ALD) nanocrystalline 20 nm thick anatase TiO{sub 2} coating. Surface topology, absorption and emission spectra of the films depend on their thickness and the material of supporting substrate. On a smooth glass surface the dye initially forms islands before merging into a uniform layer after 5 to 10 monolayers. On FTO covered glass the absorption spectra are similar to fluorescein solution in ethanol. Absorption spectra on ALD-TiO{sub 2} is red shifted compared to the film deposited on bare FTO. The corresponding emission spectra at {lambda} = 458 nm excitation show various thickness and substrate dependent features, while the emission of films deposited on TiO{sub 2} is quenched due to the effective electron transfer to the semiconductor conduction band.

  14. The Effect of Deposition Time on Textured Magnesium Diboride Thick Films Fabricated by Electrophoretic Deposition

    Directory of Open Access Journals (Sweden)

    W. G. Mutia

    2004-12-01

    Full Text Available MgB2 powders suspended in ethanol were electrophoretically deposited on high-purity molybdenum substrates having dimensions of 1 x 0.3 x 0.01 cm. The said substrate was set as the cathode and was placed 0.5 cm away from a graphite rod anode. A current density of ~0.02 mA/cm2 and a voltage of 600 V were applied. The effect of deposition time was studied by varying it as follows: 15 s, 30 s, 1 min, and 2 min. Heat treatment at 950 oC for 3 h was done after deposition. MgB2 thick films were successfully fabricated for the deposition carried out for 2 min. Deposition times less than 2 min resulted in insufficient deposited powder; hence formation of MgB2 was not facilitated. Films deposited at 15 and 30 s have good surface characteristics, wherein no microcracks were present. X-ray diffraction and surface image analysis reveal that the deposited films have a preferred orientation along the (10l direction.

  15. Morphological Study Of Palladium Thin Films Deposited By Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Salcedo, K L; Rodriguez, C A [Grupo Plasma Laser y Aplicaciones, Ingenieria Fisica, Universidad Tecnologica de Pereira (Colombia); Perez, F A [WNANO, West Virginia University (United States); Riascos, H [Grupo Plasma Laser y Aplicaciones, Departamento de Fisica, Universidad Tecnologica de Pereira (Colombia)

    2011-01-01

    This paper presents a morphological analysis of thin films of palladium (Pd) deposited on a substrate of sapphire (Al{sub 2}O{sub 3}) at a constant pressure of 3.5 mbar at different substrate temperatures (473 K, 523 K and 573 K). The films were morphologically characterized by means of an Atomic Force Microscopy (AFM); finding a relation between the roughness and the temperature. A morphological analysis of the samples through AFM was carried out and the roughness was measured by simulating the X-ray reflectivity curve using GenX software. A direct relation between the experimental and simulation data of the Palladium thin films was found.

  16. Alternating deposition films of a polymer and dendrimers bearing diphenylanthracene

    Institute of Scientific and Technical Information of China (English)

    SUN Jing; WANG Liyan; GAO Jian; YU Xi; WANG Zhiqiang

    2005-01-01

    Two generations of carboxyl-terminated poly (aryl ether) dendrimers bearing 9,10-diphenylanthracene cores are designed and synthesized. Alternating deposition of two dendrimers and poly(4-vinylpyridine) is studied with UV-Vis spectroscopy, FT-IR spectroscopy and atomic force microscopy. Experimental results indicate that this method to introduce chromophore into multilayer film can effectively prevent desorption of dye molecule. Moreover, it is found that dendrimer can inhibit the aggregation of fluorophore in film using fluorescence spectroscopy. Increase of dendrimer's generation can enhance fluorescence intensity of each fluorophore. This provides a new approach to design luminescent thin film.

  17. Impact toughness of tungsten films deposited on martensite stainless steel

    Institute of Scientific and Technical Information of China (English)

    HUANG Ning-kang; YANG Bin; WANG De-zhi

    2005-01-01

    Tungsten films were deposited on stainless steel Charpy specimens by magnetron sputtering followed by electron beam heat treatment. Charpy impact tests and scanning electron microscopy were used to investigate the ductile-brittle transition behavior of the specimens. With decreasing test temperature the fracture mode was transformed from ductile to brittle for both kinds of specimens with and without W films. The data of the crack initiation energy, crack propagation energy, impact absorbing energy, fracture time and deflection as well as the fracture morphologies at test temperature of -70 ℃ show that W films can improve the impact toughness of stainless steel.

  18. Oxide films: low-temperature deposition and crystallization

    Science.gov (United States)

    Park, Sangmoon; Herman, Gregory S.; Keszler, Douglas A.

    2003-10-01

    Thin films of CeO 2 and (Ce,Sm)O 2 have been prepared by using the SILAR method of deposition in conjunction with hydrothermal and high-temperature annealing. Low-temperature, low-pressure hydrothermal annealing of amorphous Mn:Zn 2GeO 4 films has lead to the growth of grains having edge lengths near 1 μm. Thick films of crystalline Zn 2SiO 4 exhibiting limited cracking have been prepared by a doctor-blade method also in conjunction with hydrothermal dehydration and annealing.

  19. Deposition of ZnO Films on Freestanding CVD Thick Diamond Films

    Institute of Scientific and Technical Information of China (English)

    SUN Jian; BAI Yi-Zhen; YANG Tian-Peng; XU Yi-Bin; WANG Xin-Sheng; DU Guo-Tong; WU Han-Hua

    2006-01-01

    @@ For ZnO/diamond structured surface acoustic wave (SAW) filters, performance is sensitively dependent on the quality of the ZnO films. In this paper, we prepare highly-oriented and fine grained polycrystalline ZnO thin films with excellent surface smoothness on the smooth nucleation surfaces of freestanding CVD diamond films by metal organic chemical vapour deposition (MOCVD). The properties of the ZnO films are characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), and photoluminescence (PL) spectrum. The influences of the deposition conditions on the quality of ZnO films are discussed briefly. ZnO/freestanding thick-diamond-film layered SAW devices with high response frequencies are expected to be developed.

  20. Cadmium Sulfide Thin Films Deposited onto MWCNT/Polysulfone Substrates by Chemical Bath Deposition

    Directory of Open Access Journals (Sweden)

    M. Moreno

    2016-01-01

    Full Text Available Cadmium sulfide (CdS thin films were deposited by chemical bath deposition (CBD onto polymeric composites with electric field-aligned multiwall carbon nanotubes (MWCNTs. MWCNT/polysulfone composites were prepared by dispersing low concentrations of MWCNTs within dissolved polysulfone (PSF. An alternating current electric field was “in situ” applied to align the MWCNTs within the dissolved polymer along the field direction until the solvent was evaporated. 80 μm thick solid MWCNT/PSF composites with an electrical conductivity 13 orders of magnitude higher than the conductivity of the neat PSF were obtained. The MWCNT/PSF composites were subsequently used as flexible substrates for the deposition of CdS thin films by CBD. Transparent and adherent CdS thin films with an average thickness of 475 nm were obtained. The values of the energy band gap, average grain size, rms roughness, crystalline structure, and preferential orientation of the CdS films deposited onto the polymeric substrate were very similar to the corresponding values of the CdS deposited onto glass (conventional substrate. These results show that the MWCNT/PSF composites with electric field-tailored MWCNTs represent a suitable option to be used as flexible conducting substrate for CdS thin films, which represents an important step towards the developing of flexible systems for photovoltaic applications.

  1. Coaxial carbon plasma gun deposition of amorphous carbon films

    Science.gov (United States)

    Sater, D. M.; Gulino, D. A.; Rutledge, S. K.

    1984-01-01

    A unique plasma gun employing coaxial carbon electrodes was used in an attempt to deposit thin films of amorphous diamond-like carbon. A number of different structural, compositional, and electrical characterization techniques were used to characterize these films. These included scanning electron microscopy, scanning transmission electron microscopy, X ray diffraction and absorption, spectrographic analysis, energy dispersive spectroscopy, and selected area electron diffraction. Optical absorption and electrical resistivity measurements were also performed. The films were determined to be primarily amorphous, with poor adhesion to fused silica substrates. Many inclusions of particulates were found to be present as well. Analysis of these particulates revealed the presence of trace impurities, such as Fe and Cu, which were also found in the graphite electrode material. The electrodes were the source of these impurities. No evidence of diamond-like crystallite structure was found in any of the film samples. Details of the apparatus, experimental procedure, and film characteristics are presented.

  2. Deposition and characterisation of epitaxial oxide thin films for SOFCs

    KAUST Repository

    Santiso, José

    2010-10-24

    This paper reviews the recent advances in the use of thin films, mostly epitaxial, for fundamental studies of materials for solid oxide fuel cell (SOFC) applications. These studies include the influence of film microstructure, crystal orientation and strain in oxide ionic conducting materials used as electrolytes, such as fluorites, and in mixed ionic and electronic conducting materials used as electrodes, typically oxides with perovskite or perovskite-related layered structures. The recent effort towards the enhancement of the electrochemical performance of SOFC materials through the deposition of artificial film heterostructures is also presented. These thin films have been engineered at a nanoscale level, such as the case of epitaxial multilayers or nanocomposite cermet materials. The recent progress in the implementation of thin films in SOFC devices is also reported. © 2010 Springer-Verlag.

  3. Polyelectrolyte Coacervates Deposited as High Gas Barrier Thin Films.

    Science.gov (United States)

    Haile, Merid; Sarwar, Owais; Henderson, Robert; Smith, Ryan; Grunlan, Jaime C

    2017-01-01

    Multilayer coatings consisting of oppositely charged polyelectrolytes have proven to be extraordinarily effective oxygen barriers but require many processing steps to fabricate. In an effort to prepare high oxygen barrier thin films more quickly, a polyelectrolyte complex coacervate composed of polyethylenimine and polyacrylic acid is prepared. The coacervate fluid is applied as a thin film using a rod coating process. With humidity and thermal post-treatment, a 2 µm thin film reduces the oxygen transmission rate of 0.127 mm poly(ethylene terephthalate) by two orders of magnitude, rivalling conventional oxygen barrier technologies. These films are fabricated in ambient conditions using low-cost, water-based solutions, providing a tremendous opportunity for single-step deposition of polymeric high barrier thin films.

  4. CHEMICALLY DEPOSITED SILVER FILM USED AS A SERS-ACTIVE OVER COATING LAYER FOR POLYMER FILM

    Institute of Scientific and Technical Information of China (English)

    Xiao-ning Liu; Gi Xue; Yun Lu; Jun Zhang; Fen-ting Li; Chen-chen Xue; Stephen Z.D. Cheng

    2001-01-01

    When colloidal silver particles were chemically deposited onto polymer film as an over-coating layer, surfaceenhanced Raman scattering (SERS) spectra could be collected for the surface analysis. SERS measurements of liquid crystal film were successfully performed without disturbing the surface morphology.

  5. Environmentally stable sputter-deposited thin films

    Energy Technology Data Exchange (ETDEWEB)

    Sharp, D.J.

    1978-03-01

    Accelerated corrosion data are presented for the titanium-silver and chrome-gold thin film metallization systems presently used at Sandia Laboratories. Improvements in corrosion, hence reliability, as a result of interposing a thin intermediate layer of either platinum or palladium are shown. Potentiometric measurements showing the alteration of corrosion potential with the use of palladium for the titanium-silver system are also presented.

  6. In situ measurement of conductivity during nanocomposite film deposition

    Energy Technology Data Exchange (ETDEWEB)

    Blattmann, Christoph O.; Pratsinis, Sotiris E., E-mail: sotiris.pratsinis@ptl.mavt.ethz.ch

    2016-05-15

    Highlights: • Flame-made nanosilver dynamics are elucidated in the gas-phase & on substrates. • The resistance of freshly depositing nanosilver layers is monitored. • Low T{sub g} polymers facilitate rapid synthesis of conductive films. • Conductive nanosilver films form on top of or within the polymer depending on MW. - Abstract: Flexible and electrically conductive nanocomposite films are essential for small, portable and even implantable electronic devices. Typically, such film synthesis and conductivity measurement are carried out sequentially. As a result, optimization of filler loading and size/morphology characteristics with respect to film conductivity is rather tedious and costly. Here, freshly-made Ag nanoparticles (nanosilver) are made by scalable flame aerosol technology and directly deposited onto polymeric (polystyrene and poly(methyl methacrylate)) films during which the resistance of the resulting nanocomposite is measured in situ. The formation and gas-phase growth of such flame-made nanosilver, just before incorporation onto the polymer film, is measured by thermophoretic sampling and microscopy. Monitoring the nanocomposite resistance in situ reveals the onset of conductive network formation by the deposited nanosilver growth and sinternecking. The in situ measurement is much faster and more accurate than conventional ex situ four-point resistance measurements since an electrically percolating network is detected upon its formation by the in situ technique. Nevertheless, general resistance trends with respect to filler loading and host polymer composition are consistent for both in situ and ex situ measurements. The time lag for the onset of a conductive network (i.e., percolation) depends linearly on the glass transition temperature (T{sub g}) of the host polymer. This is attributed to the increased nanoparticle-polymer interaction with decreasing T{sub g}. Proper selection of the host polymer in combination with in situ resistance

  7. Fundamental Mechanisms of Roughening and Smoothing During Thin Film Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Headrick, Randall [Univ. of Vermont, Burlington, VT (United States)

    2016-03-18

    In this research program, we have explored the fundamental limits for thin film deposition in both crystalline and amorphous (i.e. non-crystalline) materials systems. For vacuum-based physical deposition processes such as sputter deposition, the background gas pressure of the inert gas (usually argon) used as the process gas has been found to be a key variable. Both a roughness transition and stress transition as a function of pressure have been linked to a common mechanism involving collisions of energetic particles from the deposition source with the process inert gas. As energetic particles collide with gas molecules in the deposition process they lose their energy rapidly if the pressure (and background gas density) is above a critical value. Both roughness and stress limit important properties of thin films for applications. In the area of epitaxial growth we have also discovered a related effect; there is a critical pressure below which highly crystalline layers grow in a layer-by-layer mode. This effect is also though to be due to energetic particle thermalization and scattering. Several other important effects such as the observation of coalescence dominated growth has been observed. This mode can be likened to the behavior of two-dimensional water droplets on the hood of a car during a rain storm; as the droplets grow and touch each other they tend to coalesce rapidly into new larger circular puddles, and this process proceeds exponentially as larger puddles overtake smaller ones and also merge with other large puddles. This discovery will enable more accurate simulations and modeling of epitaxial growth processes. We have also observed that epitaxial films undergo a roughening transition as a function of thickness, which is attributed to strain induced by the crystalline lattice mismatch with the substrate crystal. In addition, we have studied another physical deposition process called pulsed laser deposition. It differs from sputter deposition due to the

  8. Structure and Morphology of Phthalocyanine Films Grown in Electrical Fields by Vapor Deposition

    Science.gov (United States)

    Zhu, Shen; Banks, C. E.; Frazier, D. O.; Penn, B.; Abdeldayem, H.; Hicks, R.; Burns, H. D.; Thompson, G. W.

    1999-01-01

    Phthalocyanine (Pc) films have been synthesized by vapor deposition on quartz substrates, some of which were coated with a very thin gold film before depositing Pc films. Electrical fields up to 6200 V/cm between a mech electrode and the substrate are introduced during film growth. These films have been characterized by x-ray diffraction and scanning electron microscopy. The molecular orientations and surface morphology of Pc films were changed under the electrical fields. The surface of these films grown without electrical field shows whisk-like morphology. When films are deposited under an electrical field, a dense film with flat surface is obtained.

  9. Chemical Vapor Deposition of Aluminum Oxide Thin Films

    Science.gov (United States)

    Vohs, Jason K.; Bentz, Amy; Eleamos, Krystal; Poole, John; Fahlman, Bradley D.

    2010-01-01

    Chemical vapor deposition (CVD) is a process routinely used to produce thin films of materials via decomposition of volatile precursor molecules. Unfortunately, the equipment required for a conventional CVD experiment is not practical or affordable for many undergraduate chemistry laboratories, especially at smaller institutions. In an effort to…

  10. Protection of elastomers with DLC film : deposition, characterization and performance

    NARCIS (Netherlands)

    Martinez Martinez, Diego

    2017-01-01

    Elastomers are materials which suffer from strong wear and cause high friction losses when subjected to dynamic contact, leading quite often to failure of the components in devices. In this Thesis, the protection of elastomers by the deposition of carbon-based films (DLC) is studied. To accomplish t

  11. Flame spray pyrolysis synthesis and aerosol deposition of nanoparticle films

    DEFF Research Database (Denmark)

    Tricoli, Antonio; Elmøe, Tobias Dokkedal

    2012-01-01

    The assembly of nanoparticle films by flame spray pyrolysis (FSP) synthesis and deposition on temperature‐controlled substrates (323–723 K) was investigated for several application‐relevant conditions. An exemplary SnO2 nanoparticle aerosol was generated by FSP and its properties (e.g., particle...

  12. YBCO thin film evaporation on as-deposited silver film on MgO

    Science.gov (United States)

    Azoulay, J.

    1999-11-01

    YBa 2Cu 3O 7- δ (YBCO) thin film was evaporated on as-deposited Ag buffer layer on MgO substrate. A simple, inexpensive vacuum system equipped with one resistively heated source was used. The subsequent heat treatment was carried out under low oxygen partial pressure at a relatively low temperature and short dwelling time. The films thus obtained were characterized for electrical properties using DC four-probe electrical measurements and inspected for structural properties and chemical composition by scanning electron microscopy (SEM). It is shown that YBCO thin film can grow on as-deposited thin silver layer on MgO substrate.

  13. Silicon Nitride Film Deposition by Photochemical Vapor Deposition Using an Argon Excimer Lamp

    Science.gov (United States)

    Maezono, Yoshinari; Toshikawa, Kiyohiko; Kurosawa, Kou; Amari, Kouichi; Ishimura, Sou; Katto, Masahito; Yokotani, Atsushi

    2007-06-01

    In this paper, we report the deposition of silicon nitride (SiNx) films for the production of semiconductor devices and flat panel displays, by chemical vapor deposition with vacuum ultraviolet excimer lamps (VUV-CVD) using SiH4 and NH3 as raw materials. An Ar2* excimer lamp (λ=126 nm, hν=9.8 eV) with a high photon energy was used to directly excite and dissociate SiH4 through a photochemical reaction. SiNx films were successfully formed at a low temperature of 100 °C with the Ar2* excimer lamp. Although the Si-rich films were obtained using an Ar2* lamp, they showed a quality almost similar to that of films obtained by conventional plasma-CVD at 400 °C.

  14. Low resistance polycrystalline diamond thin films deposited by hot filament chemical vapour deposition

    Indian Academy of Sciences (India)

    Mahtab Ullah; Ejaz Ahmed; Abdelbary Elhissi; Waqar Ahmed

    2014-05-01

    Polycrystalline diamond thin films with outgrowing diamond (OGD) grains were deposited onto silicon wafers using a hydrocarbon gas (CH4) highly diluted with H2 at low pressure in a hot filament chemical vapour deposition (HFCVD) reactor with a range of gas flow rates. X-ray diffraction (XRD) and SEM showed polycrystalline diamond structure with a random orientation. Polycrystalline diamond films with various textures were grown and (111) facets were dominant with sharp grain boundaries. Outgrowth was observed in flowerish character at high gas flow rates. Isolated single crystals with little openings appeared at various stages at low gas flow rates. Thus, changing gas flow rates had a beneficial influence on the grain size, growth rate and electrical resistivity. CVD diamond films gave an excellent performance for medium film thickness with relatively low electrical resistivity and making them potentially useful in many industrial applications.

  15. Pyrolytic carbon film deposit as an electrochemical interface.

    Directory of Open Access Journals (Sweden)

    M. Hadi

    2009-02-01

    Full Text Available A pyrolytic carbon (PC film was grown on planar substrate (graphite rods by chemical vapor deposition from gaseous feed of methane using a vertical hot-wall deposition reactor. Scanning electron microscopy was used to study the surface structure. The PC film was also characterized by cyclic voltammetry technique to evaluate the background current, stability and the electrochemical response using ascorbic acid, Co(phen32+/3+ and Fe(CN6 3-/4- redox couplesand compared to glassy carbon (GC electrode. High degree of electrochemical activity and the enhanced signal to background (S/B ratio demonstrated that the PC film might be an attractive electrode material for electroanalytical measurements.

  16. Directed vapor deposition of lithium manganese oxide films

    Science.gov (United States)

    Jin, Sang-Wan

    Electron beam evaporation and sputtering techniques are used to fabricate multilayered thin film structures. However, these techniques suffer several drawbacks resulting from (i) the complex chemistries of the lithiated oxide layers used for the cathode and electrolyte, (ii) the need for precise microstructure control in systems with many metastable phases, and (iii) the low deposition rate and poor material utilization efficiency, which slows the application of this energy storage approach. This dissertation has investigated the use of a novel electron-beam directed vapor deposition (EB-DVD) method for the synthesis of thin film batteries. The dissertation focuses upon the cathode layer of a representative Li-ion thin film battery system and investigates in detail the deposition of lithium manganese oxide films. Many phases with offering various electrochemical performance exist in the Li-Mn-O system and the thesis also investigates the use of processing conditions to control the structure and composition of these cathode layers. In the EB-DVD approach, a high voltage electron beam is used to evaporate a source material in the throat of a nozzle that forms a coaxial transonic gas jet around the vapor. The gas jet entrains and transports the vapor to a substrate where the deposition occurs. Directed simulation of Monte Carlo (DSMC) methods indicated that the vapor plume could be matched to a substrate diameter, and the deposition rate (and vapor utilization efficiency) therefore controlled by adjusting the pressure ratio up and downstream of the nozzle opening in the deposition chamber, and by varying the gas jet density and speed. The highest deposition rates were obtained with a high pressure ratio and the gas jet density. These observations are found to be consistent with the experimental results. Deposition rates up to 16 nm/s could be achieved using the most effective gas entrainment conditions identified by DSMC calculation. This was about a factor of ten

  17. Structural and optical properties of tellurite thin film glasses deposited by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Munoz-Martin, D.; Fernandez-Navarro, J.M. [Laser Processing Group, Instituto de Optica (CSIC), Serrano 121, 28006 Madrid (Spain); Gonzalo, J., E-mail: j.gonzalo@io.cfmac.csic.es [Laser Processing Group, Instituto de Optica (CSIC), Serrano 121, 28006 Madrid (Spain); Jose, G.; Jha, A. [Institute for Materials Research, University of Leeds, Clarendon Road, Leeds LS2 9JT (United Kingdom); Fierro, J.L.G. [Instituto de Catalisis y Petroleoquimica (CSIC), Marie Curie s/n, 28049 Cantoblanco (Spain); Domingo, C. [Instituto de Estructura de la Materia (CSIC), Serrano 121, 28006 Madrid (Spain); Garcia-Lopez, J. [Centro Nacional de Aceleradores, P. Tecnologico ' Cartuja 93' , 41092 Sevilla (Spain)

    2011-10-31

    Tellurite (TeO{sub 2}-TiO{sub 2}-Nb{sub 2}O{sub 5}) thin film glasses have been produced by pulsed laser deposition at room temperature at laser energy densities in the range of 0.8-1.5 J/cm{sup 2} and oxygen pressures in the range of 3-11 Pa. The oxygen concentration in the films increases with laser energy density to reach values very close to that of the bulk glass at 1.5 J/cm{sup 2}, while films prepared at 1.5 J/cm{sup 2} and pressures above 5 Pa show oxygen concentration in excess of 10% comparing to the glass. X-ray photoelectron spectroscopy shows the presence of elementary Te in films deposited at O{sub 2} pressures {<=} 5 Pa that is not detected at higher pressures, while analysis of Raman spectra of the samples suggests a progressive substitution of TeO{sub 3} trigonal pyramids by TeO{sub 4} trigonal bipyramids in the films when increasing their oxygen content. Spectroscopic ellipsometry analysis combined with Cauchy and effective medium modeling demonstrates the influence of these compositional and structural modifications on the optical response of the films. Since the oxygen content determines their optical response through the structural modifications induced in the films, those can be effectively controlled by tuning the deposition conditions, and films having large n (2.08) and reduced k (< 10{sup -4}) at 1.5 {mu}m have been produced using the optimum deposition conditions.

  18. Dual ion beam deposition of carbon films with diamondlike properties

    Science.gov (United States)

    Mirtich, M. J.; Swec, D. M.; Angus, J. C.

    1984-01-01

    A single and dual ion beam system was used to generate amorphous carbon films with diamond like properties. A methane/argon mixture at a molar ratio of 0.28 was ionized in the low pressure discharge chamber of a 30-cm-diameter ion source. A second ion source, 8 cm in diameter was used to direct a beam of 600 eV Argon ions on the substrates (fused silica or silicon) while the deposition from the 30-cm ion source was taking place. Nuclear reaction and combustion analysis indicate H/C ratios for the films to be 1.00. This high value of H/C, it is felt, allowed the films to have good transmittance. The films were impervious to reagents which dissolve graphitic and polymeric carbon structures. Although the measured density of the films was approximately 1.8 gm/cu cm, a value lower than diamond, the films exhibited other properties that were relatively close to diamond. These films were compared with diamondlike films generated by sputtering a graphite target.

  19. Pulsed laser deposition of nano-glassy carbon films

    Energy Technology Data Exchange (ETDEWEB)

    Ossi, P.M. [Dip. Ingegneria Nucleare and Centre of Excellence, NanoEngineered Materials and Surfaces (NEMAS), Politecnico di Milano, via Ponzio, 34-3, 20133 Milan (Italy)]. E-mail: paolo.ossi@polimi.it; Bottani, C.E. [Dip. Ingegneria Nucleare and Centre of Excellence, NanoEngineered Materials and Surfaces (NEMAS), Politecnico di Milano, via Ponzio, 34-3, 20133 Milan (Italy); Miotello, A. [Dip. Fisica, Universita di Trento, 38050 Povo (TN) (Italy)

    2005-07-30

    Carbon films have been deposited at room temperature on (1 0 0) Si substrates by pulsed laser ablation (PLA) from a highly oriented pyrolitic graphite source. Changing the laser power density from 8.5 to 19 MW mm{sup -2} and using various ambient atmospheres (helium, argon from 0.6 Pa to 2 kPa), nano-sized cluster-assembled films were obtained. Scanning electron microscopy shows that the film morphology, changes with increasing ambient gas pressure. We observed in the sequence: dense columns, node-like morphology, platelets (only in argon) and an open dendritic structure. By atomic force microscopy, on representative films, we evaluated the size distribution and relative abundancy of aggregates of carbon clusters, as well as film roughness. Raman spectroscopy shows that all the films are sp{sup 2} coordinated, structurally disordered and belong to the family of carbon nano-glasses. The estimated film coherence length gives an average size of about 5 nm for the agglomerated carbon clusters in the films. The average number of carbon atoms per cluster depends on ambient gas pressure, but is nearly independent of laser intensity.

  20. Effective conductivity of chemically deposited ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Robles, M. [Universidad Autonoma del Estado de Morelos (UAEM), Cuernavaca (Mexico). Fac. de Ciencias; Tagueena-Martinez, J. [IIM-UNAM, Temixco, Morelos (Mexico). Lab. de Energia Solar; Del Rio, J.A. [IIM-UNAM, Temixco, Morelos (Mexico). Lab. de Energia Solar

    1997-01-30

    Chemically deposited thin films have multiple applications. However, as a result of their complex structure, their physical properties are very difficult to predict. In this paper, we use an effective medium approach to model these heterogeneous systems. We extend Thorpe`s formula for the effective electrical conductivity of elliptical holes randomly distributed in a matrix to a system composed of conducting ellipses in a conducting matrix. This extension is used to calculate the effective electrical conductivity of polycrystalline chemically deposited ZnO thin films. We compare experimental results obtained by two different deposition methods: spray pyrolysis and successive ion layer adsorption and reaction (SILAR) reported here. We select the elliptical geometric parameters from microstructural data. Good agreement between the experimental measurements and our calculation is obtained. In addition, we present a new proof of the reciprocity theorem used to derive the theoretical relation. (orig.)

  1. Deposition of thermal and hot-wire chemical vapor deposition copper thin films on patterned substrates.

    Science.gov (United States)

    Papadimitropoulos, G; Davazoglou, D

    2011-09-01

    In this work we study the hot-wire chemical vapor deposition (HWCVD) of copper films on blanket and patterned substrates at high filament temperatures. A vertical chemical vapor deposition reactor was used in which the chemical reactions were assisted by a tungsten filament heated at 650 degrees C. Hexafluoroacetylacetonate Cu(I) trimethylvinylsilane (CupraSelect) vapors were used, directly injected into the reactor with the aid of a liquid injection system using N2 as carrier gas. Copper thin films grown also by thermal and hot-wire CVD. The substrates used were oxidized silicon wafers on which trenches with dimensions of the order of 500 nm were formed and subsequently covered with LPCVD W. HWCVD copper thin films grown at filament temperature of 650 degrees C showed higher growth rates compared to the thermally ones. They also exhibited higher resistivities than thermal and HWCVD films grown at lower filament temperatures. Thermally grown Cu films have very uniform deposition leading to full coverage of the patterned substrates while the HWCVD films exhibited a tendency to vertical growth, thereby creating gaps and incomplete step coverage.

  2. Photocatalytic ability of TiO2 porous film prepared by modified spray pyrolysis deposition technique

    National Research Council Canada - National Science Library

    SUGIYAMA, Osamu; OKUYA, Masayuki; KANEKO, Shoji

    2009-01-01

    In a spray pyrolysis deposition (SPD) technique, deposition of film material and formation of surface structure are simultaneously occur, therefore, it is suitable for the preparation of microstructure-controlled thin films...

  3. Annealing dependence of residual stress and optical properties of TiO2 thin film deposited by different deposition methods.

    Science.gov (United States)

    Chen, Hsi-Chao; Lee, Kuan-Shiang; Lee, Cheng-Chung

    2008-05-01

    Titanium oxide (TiO(2)) thin films were prepared by different deposition methods. The methods were E-gun evaporation with ion-assisted deposition (IAD), radio-frequency (RF) ion-beam sputtering, and direct current (DC) magnetron sputtering. Residual stress was released after annealing the films deposited by RF ion-beam or DC magnetron sputtering but not evaporation, and the extinction coefficient varied significantly. The surface roughness of the evaporated films exceeded that of both sputtered films. At the annealing temperature of 300 degrees C, anatase crystallization occurred in evaporated film but not in the RF ion-beam or DC magnetron-sputtered films. TiO(2) films deposited by sputtering were generally more stable during annealing than those deposited by evaporation.

  4. Vacuum deposition onto webs, films and foils

    CERN Document Server

    Bishop, Charles A

    2011-01-01

    Roll-to-roll vacuum deposition is the technology that applies an even coating to a flexible material that can be held on a roll and provides a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces, such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging (e.g. snack packets). Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology: solar energy products are moving from rigid panels onto flexible substrates, which are cheaper and more versatile; in a similar way, electronic circuit 'boards' can be produced on a flexible polymer, creating a new range of 'flexible electronics' products; and, flexible displays are another area of new technology in vacuum coating, with flexible display panels and light sources emerging. Charles Bishop has written this book to meet the need he identified, as a t...

  5. Enhanced Bactericidal Activity of Silver Thin Films Deposited via Aerosol-Assisted Chemical Vapor Deposition

    OpenAIRE

    Ponja, S. D.; Sehmi, S. K.; Allan, E.; MacRobert, A. J.; Parkin, I. P.; Carmalt, C. J.

    2015-01-01

    Silver thin films were deposited on SiO2-barrier-coated float glass, fluorine-doped tin oxide (FTO) glass, Activ glass, and TiO2-coated float glass via AACVD using silver nitrate at 350 °C. The films were annealed at 600 °C and analyzed by X-ray powder diffraction, X-ray photoelectron spectroscopy, UV/vis/near-IR spectroscopy, and scanning electron microscopy. All the films were crystalline, and the silver was present in its elemental form and of nanometer dimension. The antibacterial activit...

  6. High conductivity transparent carbon nanotube films deposited from superacid

    Energy Technology Data Exchange (ETDEWEB)

    Hecht, David S; Lee, Roland; Hu Liangbing [Unidym Incorporated, 1244 Reamwood Drive, Sunnyvale, CA 94089 (United States); Heintz, Amy M; Moore, Bryon; Cucksey, Chad; Risser, Steven, E-mail: dhecht@gmail.com [Battelle, 505 King Avenue, Columbus, OH 43201 (United States)

    2011-02-18

    Carbon nanotubes (CNTs) were deposited from a chlorosulfonic superacid solution onto PET substrates by a filtration/transfer method. The sheet resistance and transmission (at 550 nm) of the films were 60 {Omega}/sq and 90.9% respectively, which corresponds to a DC conductivity of 12 825 S cm{sup -1} and a DC/optical conductivity ratio of 64.1. This is the highest DC conductivity reported for CNT thin films to date, and attributed to both the high quality of the CNT material and the exfoliation/doping by the superacid. This work demonstrates that CNT transparent films have not reached the conductivity limit; continued improvements will enable these films to be used as the transparent electrode for applications in solid state lighting, LCD displays, touch panels, and photovoltaics.

  7. High conductivity transparent carbon nanotube films deposited from superacid.

    Science.gov (United States)

    Hecht, David S; Heintz, Amy M; Lee, Roland; Hu, Liangbing; Moore, Bryon; Cucksey, Chad; Risser, Steven

    2011-02-18

    Carbon nanotubes (CNTs) were deposited from a chlorosulfonic superacid solution onto PET substrates by a filtration/transfer method. The sheet resistance and transmission (at 550 nm) of the films were 60 Ω/sq and 90.9% respectively, which corresponds to a DC conductivity of 12,825 S cm(-1) and a DC/optical conductivity ratio of 64.1. This is the highest DC conductivity reported for CNT thin films to date, and attributed to both the high quality of the CNT material and the exfoliation/doping by the superacid. This work demonstrates that CNT transparent films have not reached the conductivity limit; continued improvements will enable these films to be used as the transparent electrode for applications in solid state lighting, LCD displays, touch panels, and photovoltaics.

  8. Reactive sputtering deposition of SiO2 thin films

    Directory of Open Access Journals (Sweden)

    IVAN RADOVIC

    2008-01-01

    Full Text Available SiO2 layers were deposited in a UHV chamber by 1 keV Ar+ ion sputtering from a high purity silicon target, using different values of the oxygen partial pressure (5×10-6–2×10-4 mbar and of the ion beam current on the target (1.67–6.85 mA. The argon partial pressure during operation of the ion gun was 1×10-3 mbar. The substrate temperature was held at 550 °C and the films were deposited to a thickness of 12.5–150 nm, at a rate from 0.0018–0.035 nm s-1. Structural characterization of the deposited thin films was performed by Rutherford backscattering spectrometry (RBS analysis. Reactive sputtering was proved to be efficient for the deposition of silica at 550 °C, an oxygen partial pressure of 2×10-4 mbar (ion beam current on the target of 5 mA or, at a lower deposition rate, ion beam current of 1.67 mA and an oxygen partial pressure of 6×10-5 mbar. One aspect of these investigations was to study the consumption of oxygen from the gas cylinder, which was found to be lower for higher deposition rates.

  9. Thin film deposition using rarefied gas jet

    Science.gov (United States)

    Pradhan, Sahadev, , Dr.

    2017-01-01

    The rarefied gas jet of aluminium is studied at Mach number Ma =(U_j /√{ kbTj / m }) in the range .01 mass and diameter, and kb is the Boltzmann constant. An important finding is that the capture width (cross-section of the gas jet deposited on the substrate) is symmetric around the centerline of the substrate, and decreases with increased Mach number due to an increase in the momentum of the gas molecules. DSMC simulation results reveals that at low Knudsen number ((Kn =0.01); shorter mean free paths), the atoms experience more collisions, which direct them toward the substrate. However, the atoms also move with lower momentum at low Mach number ,which allows scattering collisions to rapidly direct the atoms to the substrate.

  10. Electrolytically deposited Cadmium Selenide Films for Photovoltaic Applications

    Directory of Open Access Journals (Sweden)

    Palaiologopoulou M. D.

    2012-10-01

    Full Text Available CdSe films were electrodeposited on pure nickel substrates. The nickel substrate was polished to a mirror finish by Al2O3 paste, etched in 10% HCl solution for 40 s and rinsed thoroughly by de-ionized water. The deposition bath contained solutions with excessive Cd2+ (0.2M from CdSO4 and small amounts of SeO2 (1x10-3 M. The pH of the bath was adjusted to a value of 2.2 at RT by adding 10% H2SO4. The bath was first thermostated at the required temperature, which varied from 55°C to 65°C. Plating was accomplished at deposition potential 1000 mV (vs. Hg/Hg2SO4. The films formed had a uniform thickness and it was found to be approximately 2.0 μm thick (for 20 min electrodeposition process. The produced CdSe films were characterized by X-Ray diffraction and SEM. The induced semiconductor doping effect by thermal annealing in pure dry nitrogen gas was also investigated. Gold contacts were placed on top of the CdSe films, either by evaporation, or mechanically. Depending on the deposition parameters the electrical characteristics of the Ni/CdSe/Au structures may exhibit rectification properties. The optical excitation of the structure was investigated for various CdSe thicknesses.

  11. Chemical bath deposition and characterization of Cu2O-CuxS thin films

    OpenAIRE

    EYA, D. D. O.

    2010-01-01

    Cu2O-CuxS thin films have been deposited on glass substrate by chemical bath deposition technique. The films were obtained by depositing Copper Sulphide (CuxS) on Copper (I) Oxide (Cu2O) and then Cu2O on CuxS. The peak solar transmittance across the thin films were found to be

  12. Production of selective membranes using plasma deposited nanochanneled thin films

    Directory of Open Access Journals (Sweden)

    Rodrigo Amorim Motta Carvalho

    2006-12-01

    Full Text Available The hydrolization of thin films obtained by tetraethoxysilane plasma polymerization results in the formation of a nanochanneled silicone like structure that could be useful for the production of selective membranes. Therefore, the aim of this work is to test the permeation properties of hydrolyzed thin films. The films were tested for: 1 permeation of polar organic compounds and/or water in gaseous phase and 2 permeation of salt in liquid phase. The efficiency of permeation was tested using a quartz crystal microbalance (QCM technique in gas phase and conductimetric analysis (CA in liquid phase. The substrates used were: silicon for characterization of the deposited films, piezoelectric quartz crystals for tests of selective membranes and cellophane paper for tests of permeation. QCM analysis showed that the nanochannels allow the adsorption and/or permeation of polar organic compounds, such as acetone and 2-propanol, and water. CA showed that the films allow salt permeation after an inhibition time needed for hydrolysis of the organic radicals within the film. Due to their characteristics, the films can be used for grains protection against microorganism proliferation during storage without preventing germination.

  13. Growth and microstructure properties of microcrystalline silicon films deposited using jet-ICPCVD

    Institute of Scientific and Technical Information of China (English)

    Zuo Zewen; Guan Wentian; Xin Yu; Lü Jin; Wang Junzhuan; Pu Lin; Shi Yi; Zheng Youdou

    2011-01-01

    Microcrystalline silicon films were deposited at a high rate and low temperature using jet-type inductively coupled plasma chemical vapor deposition (jet-ICPCVD).An investigation into the deposition rate and microstructure properties of the deposited films showed that a high deposition rate of over 20 nm/s can be achieved while maintaining reasonable material quality.The deposition rate can be controlled by regulating the generation rate and transport of film growth precursors.The film with high crystallinity deposited at low temperature could principally result from hydrogen-induced chemical annealing.

  14. Polymer-assisted deposition of metal-oxide films.

    Science.gov (United States)

    Jia, Q X; McCleskey, T M; Burrell, A K; Lin, Y; Collis, G E; Wang, H; Li, A D Q; Foltyn, S R

    2004-08-01

    Metal oxides are emerging as important materials for their versatile properties such as high-temperature superconductivity, ferroelectricity, ferromagnetism, piezoelectricity and semiconductivity. Metal-oxide films are conventionally grown by physical and chemical vapour deposition. However, the high cost of necessary equipment and restriction of coatings on a relatively small area have limited their potential applications. Chemical-solution depositions such as sol-gel are more cost-effective, but many metal oxides cannot be deposited and the control of stoichiometry is not always possible owing to differences in chemical reactivity among the metals. Here we report a novel process to grow metal-oxide films in large areas at low cost using polymer-assisted deposition (PAD), where the polymer controls the viscosity and binds metal ions, resulting in a homogeneous distribution of metal precursors in the solution and the formation of uniform metal-organic films. The latter feature makes it possible to grow simple and complex crack-free epitaxial metal-oxides.

  15. Oxidative chemical vapor deposition of polyaniline thin films.

    Science.gov (United States)

    Smolin, Yuriy Y; Soroush, Masoud; Lau, Kenneth K S

    2017-01-01

    Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony pentachloride as oxidant. Microscopy and spectroscopy indicate that oCVD processing conditions influence the PANI film chemistry, oxidation, and doping level. Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS) indicate that a substrate temperature of 90 °C is needed to minimize the formation of oligomers during polymerization. Lower substrate temperatures, such as 25 °C, lead to a film that mostly includes oligomers. Increasing the oxidant flowrate to nearly match the monomer flowrate favors the deposition of PANI in the emeraldine state, and varying the oxidant flowrate can directly influence the oxidation state of PANI. Changing the reactor pressure from 700 to 35 mTorr does not have a significant effect on the deposited film chemistry, indicating that the oCVD PANI process is not concentration dependent. This work shows that oCVD can be used for depositing PANI and for effectively controlling the chemical state of PANI.

  16. Silicon nanomembranes as a means to evaluate stress evolution in deposited thin films

    Science.gov (United States)

    Anna M. Clausen; Deborah M. Paskiewicz; Alireza Sadeghirad; Joseph Jakes; Donald E. Savage; Donald S. Stone; Feng Liu; Max G. Lagally

    2014-01-01

    Thin-film deposition on ultra-thin substrates poses unique challenges because of the potential for a dynamic response to the film stress during deposition. While theoretical studies have investigated film stress related changes in bulk substrates, little has been done to learn how stress might evolve in a film growing on a compliant substrate. We use silicon...

  17. Liposomes as drug deposits in multilayered polymer films.

    Science.gov (United States)

    Lynge, Martin E; Laursen, Marie Baekgaard; Hosta-Rigau, Leticia; Jensen, Bettina E B; Ogaki, Ryosuke; Smith, Anton A A; Zelikin, Alexander N; Städler, Brigitte

    2013-04-24

    The ex vivo growth of implantable hepatic or cardiac tissue remains a challenge and novel approaches are highly sought after. We report an approach to use liposomes embedded within multilayered films as drug deposits to deliver active cargo to adherent cells. We verify and characterize the assembly of poly(l-lysine) (PLL)/alginate, PLL/poly(l-glutamic acid), PLL/poly(methacrylic acid) (PMA), and PLL/cholesterol-modified PMA (PMAc) films, and assess the myoblast and hepatocyte adhesion to these coatings using different numbers of polyelectrolyte layers. The assembly of liposome-containing multilayered coatings is monitored by QCM-D, and the films are visualized using microscopy. The myoblast and hepatocyte adhesion to these films using PLL/PMAc or poly(styrenesulfonate) (PSS)/poly(allyl amine hydrochloride) (PAH) as capping layers is evaluated. Finally, the uptake of fluorescent lipids from the surface by these cells is demonstrated and compared. The activity of this liposome-containing coating is confirmed for both cell lines by trapping the small cytotoxic compound thiocoraline within the liposomes. It is shown that the biological response depends on the number of capping layers, and is different for the two cell lines when the compound is delivered from the surface, while it is similar when administered from solution. Taken together, we demonstrate the potential of liposomes as drug deposits in multilayered films for surface-mediated drug delivery.

  18. Poly-para-xylylene thin films: A study of the deposition chemistry, kinetics, film properties, and film stability

    Science.gov (United States)

    Fortin, Jeffrey Bernard

    Poly-para-xylylene, or parylene, thin films are chemically vapor deposited (CVD), conformal, pin-hole free polymeric thin films. They have found many industrial uses since there invention in 1947 and continue to find new applications in micro-electronics, biotechnology, and micro-electro-mechanical systems. In this study the deposition chemistry, deposition kinetics, film properties, and film stability were investigated. A differentially pumped quadrupole mass spectrometer was used to analyze the vapor species present during the CVD process. The identity of dimer contamination and its impact on the CVD process and film properties was studied. The quantitative conversion of dimer to monomer was investigated and it was found that conversion begins at around 385°C and by 565°C 100% conversion is obtained. The kinetics of the CVD process was analyzed for a range of substrate temperatures and chamber pressures. A new kinetic model based on a two-step adsorption was developed and fit the kinetic data well. This model should be appropriate for use with all parylene family polymers. Many of the properties of the films deposited in this study were analyzed. This includes a detailed study of surface morphology using atomic force microscopy which shows the interface width increases as a power law of film thickness. Other properties analyzed were the thermal stability, electrical properties, index of refraction, birefringence, hardness, and elastic modulus. The effect of ultraviolet (UV) radiation of lambda ≥ 250 nm on the thermal stability, electrical, and optical properties of thin parylene films was studied. The thermal stability and electrical properties of UV treated films were seen to deteriorate as the radiation dose increased. The stability of parylene thin films receiving plasma etching was analyzed. The dielectric constant, dissipation factor, and leakage current of plasma etched thin parylene films were investigated and found to be stable for the range of

  19. Synthesis, deposition and characterization of ferroelectric films for electrooptic devices

    Science.gov (United States)

    Tunaboylu, Bahadir

    The use of integrable ferroelectric electro-optic thin films is a revolutionary approach in the development of high-speed, low-voltage and high-contrast ratio integrated electro-optic spatial light modulators (SLM) for free-space optoelectronic interconnects. Thin films offer improved performance over bulk ferroelectric (FE) materials because of their lower modulator capacitance and operation at high speeds with low switching energies. Integration of ferroelectric thin films with silicon technology will also impact both the uncooled infrared sensor and dynamic and nonvolatile memory technologies. Ferroelectrics such as lead lanthanum zirconate titanate (PLZT) and patassium tantalate niobate (KTN) present great potential for SLMs due to their large electro-optic (EO) effect in the bulk form. The development of thin-film SLMs require electro-optic films of high optical quality with good dielectric and EO properties. High quality thin films of PLZT and KTN were deposited using RF magnetron sputtering on r-plane sapphire substrates which offer integration capability with semiconductor devices. PLZT films with extremely large peak dielectric constant, 2800 at the Curie temperature of 180sp°C, were achieved with remarkably low dissipation loss factor dielectric frequency dispersion was determined to be very small up to 1 Mhz. Also, the absorption of the light in the films was very low. A giant effective quadratic electrooptic effect was demonstrated in PLZT films. These results represent a huge leap forward for the FE-SLM technology with respect to the goal of fully integrated thin film electrooptic light modulators. Microstructural development and phase transformation kinetics in PLZT films were also analyzed for the first time and are presented here. Energy required for the formation of desirable perovskite phase was determined to be 322 kJ/mol. Single-phase PLZT films with larger average grain size showed higher dielectric constants and better EO properties as

  20. Ultraviolet optical properties of aluminum fluoride thin films deposited by atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Hennessy, John, E-mail: john.j.hennessy@jpl.nasa.gov; Jewell, April D.; Balasubramanian, Kunjithapatham; Nikzad, Shouleh [Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, Pasadena, California 91109 (United States)

    2016-01-15

    Aluminum fluoride (AlF{sub 3}) is a low refractive index material with promising optical applications for ultraviolet (UV) wavelengths. An atomic layer deposition process using trimethylaluminum and anhydrous hydrogen fluoride has been developed for the deposition of AlF{sub 3} at substrate temperatures between 100 and 200 °C. This low temperature process has resulted in thin films with UV-optical properties that have been characterized by ellipsometric and reflection/transmission measurements at wavelengths down to 200 nm. The optical loss for 93 nm thick films deposited at 100 °C was measured to be less than 0.2% from visible wavelengths down to 200 nm, and additional microstructural characterization demonstrates that the films are amorphous with moderate tensile stress of 42–105 MPa as deposited on silicon substrates. X-ray photoelectron spectroscopy analysis shows no signature of residual aluminum oxide components making these films good candidates for a variety of applications at even shorter UV wavelengths.

  1. Deposition and consolidation of porous ceramic films for membrane separation

    DEFF Research Database (Denmark)

    Elmøe, Tobias Dokkedal; Tricoli, Antonio; Johannessen, Tue

    The deposition of porous ceramic films for membrane separation can be done by several processes such as thermophoresis [1], dip-coating [2] and spray pyrolysis [3]. Here we present a high-speed method, in which ceramic nano-particles form a porous film by filtration on top of a porous ceramic...... substrate [4]. Ceramic nano-particles are generated in a flame, using either a premixed (gas) flame, in which a metal-oxide precursor is evaporated in an N2 stream, which is combusted with methane and air, or using a flame spray pyrolysis, in which a liquid metal-oxide precursor is sprayed through a nozzle...

  2. Structural and Optical Properties of Chemical Bath Deposited Silver Oxide Thin Films: Role of Deposition Time

    Directory of Open Access Journals (Sweden)

    A. C. Nwanya

    2013-01-01

    Full Text Available Silver oxide thin films were deposited on glass substrates at a temperature of 50°C by chemical bath deposition technique under different deposition times using pure AgNO3 precursor and triethanolamine as the complexing agent. The chemical analysis based on EDX technique shows the presence of Ag and O at the appropriate energy levels. The morphological features obtained from SEM showed that the AgxO structures varied as the deposition time changes. The X-ray diffraction showed the peaks of Ag2O and AgO in the structure. The direct band gap and the refractive index increased as the deposition time increased and was in the range of 1.64–1.95 eV and 1.02–2.07, respectively. The values of the band gap and refractive index obtained indicate possible applications in photovoltaic and photothermal systems.

  3. Rapid Deposition of Titanium Oxide and Zinc Oxide Films by Solution Precursor Plasma Spray

    Science.gov (United States)

    Ando, Yasutaka

    In order to develop a high rate atmospheric film deposition process for functional films, as a basic study, deposition of titanium oxide film and zinc oxide film by solution precursor plasma spray (SPPS) was conducted in open air. Consequently, in the case of titanium oxide film deposition, anantase film and amorphous film as well as rutile film could be deposited by varying the deposition distance. In the case of anatase dominant film, photo-catalytic properties of the films could be confirmed by wettability test. In addition, the dye sensitized sollar cell (DSC) using the TiO2 film deposited by this SPPS technique as photo voltaic device generates 49mV in OCV. On the other hand, in the case of zinc oxide film deposition, it was proved that well crystallized ZnO films with photo catalytic properties could be deposited. From these results, this process was found to have high potential for high rate functional film deposition process conducted in the air.

  4. Electrophoretic deposition and constrained sintering of strontium titanate thick films

    Energy Technology Data Exchange (ETDEWEB)

    Amaral, Luís; Vilarinho, Paula M., E-mail: paula.vilarinho@ua.pt; Senos, Ana M.R.

    2015-01-15

    Thick films of functional oxides are currently substituting counterparts bulk ceramics, as in the case of low loss dielectrics. For SrTiO{sub 3} (ST) based compositions it is demonstrated that electrophoretic deposition (EPD), using acetone as a suspension media with iodine addition, is a suitable technology to fabricate 12 μm thick films. The microstructural analysis of the films sintered at 1500 °C shows that highly densified microstructures can be obtained and, by slightly varying the Sr/Ti stoichiometry in the powder composition, increased densification and grain size and enlargement of the distribution with decreasing Sr/Ti ratio can be observed. In spite of the high densification of the films, it is also demonstrated that due to the constraint imposed by the substrate a smaller grain size is observed in thick films as compared to equivalent bulk ceramics. In addition, a preferential vertical pore orientation is observed in ST thick films. These results may have broad implications if one considers that the dielectric losses and dielectric tunability is affected by pore orientation, since it affects the electric field distribution. - Highlights: • Nonstoichiometry effect on microstructure of constrained sintered thick films and bulk is similar. • Increased densification and grain size and enlargement of distribution with decreasing Sr/Ti ratio. • Independent of Sr/Ti ratio smaller grain size for thick films compared to ceramics. • Preferential vertical pore orientation for constrained sintering of thick films. • Anisotropic porosity as tailoring factor to engineer permittivity and tunability.

  5. The structural characterisation of HWCVD-deposited nanocrystalline silicon films

    Directory of Open Access Journals (Sweden)

    Bibhu P. Swain

    2009-12-01

    Full Text Available Nanocrystalline silicon (nc-Si films were deposited by hot-wire chemical vapour deposition (HWCVD in the presence of varying H2 concentrations and their structural and interfacial character investigated by X-ray diffraction, small-angle X-ray scattering (SAXS and Raman spectroscopy. The crystalline fraction was around 30–50% and the nc-Si crystallite size was in the range 20–35 nm. The SAXS results were analysed by Guinier plot, scaling factor, and correlation distance. The nc-Si grains displayed a mass fractal appearance, and the interfacial inhomogeneity distance was ~2 nm.

  6. Growth Model for Pulsed-Laser Deposited Perovskite Oxide Films

    Institute of Scientific and Technical Information of China (English)

    WANG Xu; FEI Yi-Yan; ZHU Xiang-Dong; Lu Hui-Bin; YANG Guo-Zhen

    2008-01-01

    We present a multi-level growth model that yields some of the key features of perovskite oxide film growth as observed in the reflection high energy electron diffraction(RHEED)and ellipsometry studies.The model describes the effect of deposition,temperature,intra-layer transport,interlayer transport and Ostwald ripening on the morphology of a growth surface in terms of the distribution of terraces and step edges during and after deposition.The numerical results of the model coincide well with the experimental observation.

  7. Nanoparticle formation and thin film deposition in aniline containing plasmas

    Science.gov (United States)

    Pattyn, Cedric; Dias, Ana; Hussain, Shahzad; Strunskus, Thomas; Stefanovic, Ilija; Boulmer-Leborgne, Chantal; Lecas, Thomas; Kovacevic, Eva; Berndt, Johannes

    2016-09-01

    This contribution deals with plasma based polymerization processes in mixtures of argon and aniline. The investigations are performed in a capacitively coupled RF discharge (in pulsed and continuous mode) and concern both the observed formation of nanoparticles in the plasma volume and the deposition of films. The latter process was used for the deposition of ultra-thin layers on different kind of nanocarbon materials (nanotubes and free standing graphene). The analysis of the plasma and the plasma chemistry (by means of mass spectroscopy and in-situ FTIR spectroscopy) is accompanied by several ex-situ diagnostics of the obtained materials which include NEXAFS and XPS measurements as well as Raman spectroscopy and electron microscopy. The decisive point of the investigations concern the preservation of the original monomer structure during the plasma polymerization processes and the stability of the thin films on the different substrates.

  8. Raman spectra of amorphous carbon films deposited by SWP

    Science.gov (United States)

    Xu, Junqi; Liu, Weiguo; Hang, Lingxia; Su, Junhong; Fan, Huiqing

    2010-10-01

    Amorphous carbon film is one of the most important anti-reflection protective films coated on infrared optical components. In this paper, hydrogen-free amorphous carbon films were deposited by new type surface-wave-sustained plasma (SWP) source with a graphite target at various experiment parameters. The laser Raman spectroscopy at wavelength of 514 nm was used to investigate the structure and bonding of these carbon films. The results showed consanguineous correlations between the intensity ratio ID/IG and the experiment parameters such as microwave power, target voltage and gas pressure applied to the SWP source. Raman spectra proved the structure of these carbon films prepared by SWP technique is typical diamond-like carbon (DLC). The analysis on G peak position and intensity ratio ID/IG indicated that Raman shifts moves to low wavenumber and ID/IG decreases with the increasing of microwave power from 150 W to 330 W. These results means the formation of sp3 bond prefers higher microwave power. DLC films prepared at target voltage of -200 V have higher sp3 content than that of -350 V, moreover, an increase of gas pressure during experiments yields higher sp3 content at the microwave power below 270 W, whereas the change of sp3 content is slight with the various conditions when microwave power exceeds 270 W.

  9. Methods of Boron-carbon Deposited Film Removal

    Science.gov (United States)

    Airapetov, A.; Terentiev, V.; Voituk, A.; Zakharov, A.

    Boron carbide was proposed as a material for in-situ renewable protecting coating for tungsten tiles of the ITER divertor. It is necessary to develop a method of gasification of boron-carbon film which deposits during B4C sputtering. In this paper the results of the first stage investigation of gasification methods of boron-carbon films are presented. Two gasification methods of films are investigated: interaction with the ozone-oxygen mixture and irradiation in plasma with the working gas composed of oxygen, ethanol, and, in some cases, helium. The gasification rate in the ozone-oxygen mixture at 250 °C for B/C films with different B/C ratio and carbon fiber composite (CFC), was measured. For B/C films the gasification rate decreased with increasing B/C ratio (from 45 nm/h at B/C=0.7 to 4 nm/h at B/C=2.1; for CFC - 15 μm/h). Films gasification rates were measured under ion irradiation from ethanol-oxygen-helium plasma at different temperatures, with different ion energies and different gas mixtures. The maximum obtained removal rate was near 230 nm/h in case of ethanol-oxygen plasma and at 150°C of the sample temperature.

  10. Reactive pulsed laser deposition of gold nitride thin films

    Energy Technology Data Exchange (ETDEWEB)

    Caricato, A.P. [University of Salento, Department of Physics, 73100 Lecce (Italy); Fernandez, M. [University of Salento, Department of Physics, 73100 Lecce (Italy); Leggieri, G. [University of Salento, Department of Physics, 73100 Lecce (Italy)]. E-mail: leggieri@le.infn.it; Luches, A. [University of Salento, Department of Physics, 73100 Lecce (Italy); Martino, M. [University of Salento, Department of Physics, 73100 Lecce (Italy); Romano, F. [University of Salento, Department of Physics, 73100 Lecce (Italy); Tunno, T. [University of Salento, Department of Physics, 73100 Lecce (Italy); Valerini, D. [University of Salento, Department of Physics, 73100 Lecce (Italy); Verdyan, A. [Science Department, Holon Academic Institute of Technology, Holon 58102 (Israel); Soifer, Y.M. [Science Department, Holon Academic Institute of Technology, Holon 58102 (Israel); Azoulay, J. [Science Department, Holon Academic Institute of Technology, Holon 58102 (Israel); Meda, L. [IGD Polimeri Europa S.p.A, Novara (Italy)

    2007-07-31

    We report on the growth and characterization of gold nitride thin films on Si <1 0 0> substrates at room temperature by reactive pulsed laser ablation. A pure (99.95%) Au target was ablated with KrF excimer laser pulses in nitrogen containing atmosphere (N{sub 2} or NH{sub 3}). The gas ambient pressure was varied in the range 0.1-100 Pa. The morphology of the films was studied by using optical, scanning electron and atomic force microscopy, evidencing compact films with RMS roughness in the range 3.6-35.1 nm, depending on the deposition pressure. Rutherford backscattering spectrometry and energy dispersion spectroscopy (EDS) were used to detect the nitrogen concentration into the films. The EDS nitrogen peak does not decrease in intensity after 2 h annealing at 250 deg. C. Film resistivity was measured using a four-point probe and resulted in the (4-20) x 10{sup -8} {omega} m range, depending on the ambient pressure, to be compared with the value 2.6 x 10{sup -8} {omega} m of a pure gold film. Indentation and scratch measurements gave microhardness values of 2-3 GPa and the Young's modulus close to 100 GPa. X-ray photoemission spectra clearly showed the N 1s peak around 400 eV and displaced with respect to N{sub 2} phase. All these measurements point to the formation of the gold nitride phase.

  11. Reactive pulsed laser deposition of gold nitride thin films

    Science.gov (United States)

    Caricato, A. P.; Fernàndez, M.; Leggieri, G.; Luches, A.; Martino, M.; Romano, F.; Tunno, T.; Valerini, D.; Verdyan, A.; Soifer, Y. M.; Azoulay, J.; Meda, L.

    2007-07-01

    We report on the growth and characterization of gold nitride thin films on Si substrates at room temperature by reactive pulsed laser ablation. A pure (99.95%) Au target was ablated with KrF excimer laser pulses in nitrogen containing atmosphere (N 2 or NH 3). The gas ambient pressure was varied in the range 0.1-100 Pa. The morphology of the films was studied by using optical, scanning electron and atomic force microscopy, evidencing compact films with RMS roughness in the range 3.6-35.1 nm, depending on the deposition pressure. Rutherford backscattering spectrometry and energy dispersion spectroscopy (EDS) were used to detect the nitrogen concentration into the films. The EDS nitrogen peak does not decrease in intensity after 2 h annealing at 250 °C. Film resistivity was measured using a four-point probe and resulted in the (4-20) × 10 -8 Ω m range, depending on the ambient pressure, to be compared with the value 2.6 × 10 -8 Ω m of a pure gold film. Indentation and scratch measurements gave microhardness values of 2-3 GPa and the Young's modulus close to 100 GPa. X-ray photoemission spectra clearly showed the N 1s peak around 400 eV and displaced with respect to N 2 phase. All these measurements point to the formation of the gold nitride phase.

  12. DLC Films Deposited by the DC PACVD Method

    Directory of Open Access Journals (Sweden)

    D. Palamarchuk

    2003-01-01

    Full Text Available DLC (Diamond-Like Carbon coatings have been suggested as protective surface layers against wear. However hard DLC coatings, especially those of greater thickness, have poor adhesion to substrates. We have used several ways to increase the adhesion of DLC coatings prepared by the PACVD (Plasma Assisted Chemical Vapour Deposition method on steel substrates. One of these is the DC PACVD method for preparing DLC films.

  13. DLC Films Deposited by the DC PACVD Method

    OpenAIRE

    D. Palamarchuk; M. Zoriy; J. Gurovič; F. Černý; S. Konvičková; I. Hüttel

    2003-01-01

    DLC (Diamond-Like Carbon) coatings have been suggested as protective surface layers against wear. However hard DLC coatings, especially those of greater thickness, have poor adhesion to substrates. We have used several ways to increase the adhesion of DLC coatings prepared by the PACVD (Plasma Assisted Chemical Vapour Deposition) method on steel substrates. One of these is the DC PACVD method for preparing DLC films.

  14. Electrochemical deposition of conductive and adhesive polypyrrole-dopamine films

    Science.gov (United States)

    Kim, Semin; Jang, Lindy K.; Park, Hyun S.; Lee, Jae Young

    2016-07-01

    Electrode surfaces have been widely modified with electrically conductive polymers, including polypyrrole (PPY), to improve the performance of electrodes. To utilize conductive polymers for electrode modification, strong adhesion between the polymer films and electrode substrates should be ensured with high electrical/electrochemical activities. In this study, PPY films were electrochemically polymerized on electrodes (e.g., indium tin oxide (ITO)) with dopamine as a bio-inspired adhesive molecule. Efficient and fast PPY electrodeposition with dopamine (PDA/PPY) was found; the resultant PDA/PPY films exhibited greatly increased adhesion strengths of up to 3.7 ± 0.8 MPa and the modified electrodes had electrochemical impedances two to three orders of magnitude lower than that of an unmodified electrode. This electrochemical deposition of adhesive and conductive PDA/PPY offers a facile and versatile electrode modification for various applications, such as biosensors and batteries.

  15. Magnetic Phases of Sputter Deposited Thin-Film Erbium

    Science.gov (United States)

    Witt, J. D. S.; Cooper, J. F. K.; Satchell, N.; Kinane, C. J.; Curran, P. J.; Bending, S. J.; Langridge, S.; Heyderman, L. J.; Burnell, G.

    2016-12-01

    We present a detailed structural and magnetic characterization of sputter deposited thin film erbium, determined by x-ray diffraction, transport measurements, magnetometry and neutron diffraction. This provides information on the onset and change of the magnetic state as a function of temperature and applied magnetic field. Many of the features of bulk material are reproduced. Also of interest is the identification of a conical magnetic state which repeats with a wavevector parallel to the c axis τc = 4/17 in units of the reciprocal lattice parameter c*, which is a state not observed in any other thin film or bulk measurements. The data from the various techniques are combined to construct magnetic field, temperature (H, T)–phase diagrams for the 200 nm-thick Er sample that serves as a foundation for future exploitation of this complex magnetic thin film system.

  16. Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films

    Energy Technology Data Exchange (ETDEWEB)

    Shin Jinhong [Texas Materials Institute, University of Texas at Austin, Austin, TX 78750 (United States); Waheed, Abdul [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Winkenwerder, Wyatt A. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Kim, Hyun-Woo [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Agapiou, Kyriacos [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Jones, Richard A. [Department of Chemistry and Biochemistry, University of Texas at Austin, Austin, TX 78712 (United States); Hwang, Gyeong S. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States); Ekerdt, John G. [Department of Chemical Engineering, University of Texas at Austin, Austin, TX 78712 (United States)]. E-mail: ekerdt@che.utexas.edu

    2007-05-07

    Chemical vapor deposition growth of amorphous ruthenium-phosphorus films on SiO{sub 2} containing {approx} 15% phosphorus is reported. cis-Ruthenium(II)dihydridotetrakis-(trimethylphosphine), cis-RuH{sub 2}(PMe{sub 3}){sub 4} (Me = CH{sub 3}) was used at growth temperatures ranging from 525 to 575 K. Both Ru and P are zero-valent. The films are metastable, becoming increasingly more polycrystalline upon annealing to 775 and 975 K. Surface studies illustrate that demethylation is quite efficient near 560 K. Precursor adsorption at 135 K or 210 K and heating reveal the precursor undergoes a complex decomposition process in which the hydride and trimethylphosphine ligands are lost at temperatures as low at 280 K. Phosphorus and its manner of incorporation appear responsible for the amorphous-like character. Molecular dynamics simulations are presented to suggest the local structure in the films and the causes for phosphorus stabilizing the amorphous phase.

  17. Nanostructured zinc oxide thin film by simple vapor transport deposition

    Science.gov (United States)

    Athma, P. V.; Martinez, Arturo I.; Johns, N.; Safeera, T. A.; Reshmi, R.; Anila, E. I.

    2015-09-01

    Zinc oxide (ZnO) nanostructures find applications in optoelectronic devices, photo voltaic displays and sensors. In this work zinc oxide nanostructures in different forms like nanorods, tripods and tetrapods have been synthesized by thermal evaporation of zinc metal and subsequent deposition on a glass substrate by vapor transport in the presence of oxygen. It is a comparatively simpler and environment friendly technique for the preparation of thin films. The structure, morphology and optical properties of the synthesized nanostructured thin film were characterized in detail by using X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDX) and photoluminescence (PL). The film exhibited bluish white emission with Commission International d'Eclairage (CIE) coordinates x = 0.22, y = 0.31.

  18. EPD-deposited ZnO thin films: a review

    Energy Technology Data Exchange (ETDEWEB)

    Verde, M.

    2014-07-01

    ZnO-based materials and specifically ZnO films with tailored morphology have been subjected to extensive research in the past few years due to their high potential for multiple prospective applications, mainly in electronics. Electrophoretic Deposition (EPD) constitutes an economical, eco friendly, low energy consuming and easily scalable alternative to the high energy consuming evaporative techniques which are commonly used for the obtaining of these ZnO films. For its application, however, the use of stable, well dispersed suspensions is a necessary requirement, and thus a thorough study of their colloidal chemistry is essential. In this work the main contributions to the study of colloidal chemistry of ZnO nanoparticle suspensions and their shaping into ZnO films by EPD are summarized. (Author)

  19. Carbon film deposition from high velocity rarefied flow

    Energy Technology Data Exchange (ETDEWEB)

    Rebrov, A.K., E-mail: rebrov@itp.nsc.ru; Emelyanov, A.A.; Yudin, I.B.

    2015-01-30

    The presented study is based on the idea of the activation of a gas-precursor high velocity flow by hot wire. The wire forms the channel for flow before expansion to substrate. The construction allows change of the specific flow rate, velocity, composition and temperature of a gas mixture by studying the film synthesis in conditions from free molecular to continuum flow at velocities from hundreds to thousands of m/s. At a high pressure, the film has typical and unusual hexagonal incorporations for diamond tetragonal particles. Raman spectrum with the pronounced diamond peak is typical for diamond-like film. X-ray diffraction points in the presence of lonsdaleite. Conditions of deposition were simulated by Monte Carlo method. Collisions with hot surfaces and chemical transformations were taken into consideration as well.

  20. Supercritical fluid molecular spray film deposition and powder formation

    Science.gov (United States)

    Smith, Richard D.

    1986-01-01

    Solid films are deposited, or fine powders formed, by dissolving a solid material into a supercritical fluid solution at an elevated pressure and then rapidly expanding the solution through a short orifice into a region of relatively low pressure. This produces a molecular spray which is directed against a substrate to deposit a solid thin film thereon, or discharged into a collection chamber to collect a fine powder. Upon expansion and supersonic interaction with background gases in the low pressure region, any clusters of solvent are broken up and the solvent is vaporized and pumped away. Solute concentration in the solution is varied primarily by varying solution pressure to determine, together with flow rate, the rate of deposition and to control in part whether a film or powder is produced and the granularity of each. Solvent clustering and solute nucleation are controlled by manipulating the rate of expansion of the solution and the pressure of the lower pressure region. Solution and low pressure region temperatures are also controlled.

  1. Superconducting niobium nitride films deposited by unbalanced magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Olaya, J.J. [Departamento de Ingenieria Mecanica y Mecatronica, Universidad Nacional de Colombia, Ciudad Universitaria, Carrera 30 Numero 45-03, Bogota (Colombia); Huerta, L. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico); Rodil, S.E. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)], E-mail: ser42@iim.unam.mx; Escamilla, R. [Instituto de Investigaciones en Materiales, Universidad Nacional Autonoma de Mexico, Circuito exterior s/n, CU Coyoacan, Mexico D.F. 04510 (Mexico)

    2008-10-01

    Niobium nitride (NbN) thin films were deposited under different configurations of the magnetic field using a magnetron sputtering system. The magnetic field configuration varied from balanced to unbalanced leading to different growth conditions and film properties. The aim of the paper was to identify correlations between deposition conditions, film properties and the electrical properties, specially the superconductive critical temperature (T{sub C}). The results suggested that there is a critical deposition condition, having an optimum ion-atom arrival ratio that promotes a well ordered and textured nanocrystalline structure (cubic phase) with the minimum residual stress and only under this condition a high critical temperature (16K) was obtained. Lower T{sub C} values around 12K were obtained for the NbN samples having a lower degree of structural perfection and texture, and a larger fraction of intergranular voids. On the other hand, analysis of valence-band spectra showed that the contribution of the Nb 4d states remained essentially constant while the higher T{sub C} was correlated to a higher contribution of the N 2p states.

  2. Structural and electrical properties of electric field assisted spray deposited pea structured ZnO film

    Science.gov (United States)

    Chaturvedi, Neha; Swami, Sanjay Kumar; Dutta, Viresh

    2016-05-01

    Spray deposition of ZnO film was carried out. The uneven growth of ZnO nanostructures is resulted for spray deposited ZnO film. Application of DC voltage (1000V) during spray deposition provides formation of pea like structures with uniform coverage over the substrate. Electric field assisted spray deposition provides increased crystallinity with reduced resistivity and improved mobility of the ZnO film as compared to spray deposited ZnO film without electric field. This with large area deposition makes the process more efficient than other techniques.

  3. Atomic layer deposition of nanolaminate oxide films on Si

    Science.gov (United States)

    Tallarida, M.; Weisheit, M.; Kolanek, K.; Michling, M.; Engelmann, H. J.; Schmeisser, D.

    2011-11-01

    Among the methods for depositing thin films, atomic layer deposition is unique for its capability of growing conformal thin films of compounds with a control of composition and thickness at the atomic level. The conformal growth of thin films can be of particular interest for covering nanostructures since it assures the homogeneous growth of the ALD film in all directions, independent of the position of the sample with respect to the incoming precursor flow. Here we describe the technique for growing the HfO2/Al2O3 bilayer on Si substrate and our in situ approach for its investigation by means of synchrotron radiation photoemission. In particular, we study the interface interactions between the two oxides for various thickness compositions ranging from 0.4 to 2.7 nm. We find that the ALD of HfO2 on Si induces the increase of the interfacial SiO2 layer, and a change in the band bending of Si. On the contrary, the ALD of Al2O3 on HfO2 shows negligible interaction between layers as the binding energies of Hf4f, Si2p, and O1s core level peaks and the valence band maximum of HfO2 do not change and the interfacial SiO2 does not increase.

  4. Plasma-enhanced Deposition of Nano-Structured Carbon Films

    Institute of Scientific and Technical Information of China (English)

    Yang Qiaoqin (杨巧勤); Xiao Chijin (肖持进); A. Hirose

    2005-01-01

    By pre-treating substrate with different methods and patterning the catalyst, selective and patterned growth of diamond and graphitic nano-structured carbon films have been realized through DC Plasma-Enhanced Hot Filament Chemical Vapor Deposition (PE-HFCVD).Through two-step processing in an HFCVD reactor, novel nano-structured composite diamond films containing a nanocrystalline diamond layer on the top of a nanocone diamond layer have been synthesized. Well-aligned carbon nanotubes, diamond and graphitic carbon nanocones with controllable alignment orientations have been synthesized by using PE-HFCVD. The orientation of the nanostructures can be controlled by adjusting the working pressure. In a Microwave Plasma Enhanced Chemical Vapor Deposition (MW-PECVD) reactor, high-quality diamond films have been synthesized at low temperatures (310 ℃~550 ℃) without adding oxygen or halogen gas in a newly developed processing technique. In this process, carbon source originates from graphite etching, instead of hydrocarbon. The lowest growth temperature for the growth of nanocrystalline diamond films with a reasonable growth rate without addition of oxygen or halogen is 260 ℃.

  5. Luminescent Nanocrystalline Silicon Carbide Thin Film Deposited by Helicon Wave Plasma Enhanced Chemical Vapour Deposition

    Institute of Scientific and Technical Information of China (English)

    LU Wan-bing; YU Wei; WU Li-ping; CUI Shuang-kui; FU Guang-sheng

    2006-01-01

    Hydrogenated nanocrystalline silicon carbide (SiC) thin films were deposited on the single-crystal silicon substrate using the helicon wave plasma enhanced chemical vapor deposition (HW-PECVD) technique. The influences of magnetic field and hydrogen dilution ratio on the structures of SiC thin film were investigated with the atomic force microscopy (AFM), the Fourier transform infrared absorption (FTIR) and the transmission electron microscopy (TEM). The results indicate that the high plasma activity of the helicon wave mode proves to be a key factor to grow crystalline SiC thin films at a relative low substrate temperature. Also, the decrease in the grain sizes from the level of microcrystalline to that of nanocrystalline can be achieved by increasing the hydrogen dilution ratios. Transmission electron microscopy measurements reveal that the size of most nanocrystals in the film deposited under the higher hydrogen dilution ratios is smaller than the doubled Bohr radius of 3C-SiC (approximately 5.4 nm), and the light emission measurements also show a strong blue photoluminescence at the room temperature, which is considered to be caused by the quantum confinement effect of small-sized SiC nanocrystals.

  6. Deposition and Tribological Properties of Sulfur-Doped DLC Films Deposited by PBII Method

    Directory of Open Access Journals (Sweden)

    Nutthanun Moolsradoo

    2010-01-01

    Full Text Available Sulfur-doped diamond-like carbon films (S-DLC fabricated from C2H2 and SF6 mixtures were used to study the effects of sulfur content and negative pulse bias voltage on the deposition and tribological properties of films prepared by plasma-based ion implantation (PBII. The structure and relative concentration of the films were analyzed by Raman spectroscopy and Auger electron spectroscopy. Hardness and elastic modulus of films were measured by nanoindentation hardness testing. Tribological characteristics of films were performed using a ball-on-disk friction tester. The results indicate that with the increasing sulfur content, the hardness and elastic modulus decrease. Additionally, by changing the negative pulse bias voltage from 0 kV to −5 kV, the hardness and elastic modulus increase, while the friction coefficient and specific wear rate tends to decrease. Moreover, at a negative pulse bias voltage of −5 kV and flow-rate ratio of 1 : 2, there is considerable improvement in friction coefficient of 0.05 under ambient air is due to the formation of a transfer films on the interface. The decrease in the friction coefficient of films doped with 4.9 at.% sulfur is greater under high vacuum (0.03 than under ambient air (>0.1.

  7. Scaling in film growth by pulsed laser deposition and modulated beam deposition.

    Science.gov (United States)

    Lee, Sang Bub

    2011-04-01

    The scalings in film growth by pulsed laser deposition (PLD) and modulated beam deposition (MBD) were investigated by Monte Carlo simulations. In PLD, an atomic pulse beam with a period t(0) were deposited instantaneously on a substrate, whereas in MBD, adatoms were deposited during a short time interval t(1) (0≤t(1)≤t(0)) within each period. If t(1)=0, MBD will be identical to PLD and, if t(1)=t(0), MBD will become usual molecular beam epitaxy (MBE). Specifically, logarithmic scaling was investigated for the nucleation density reported for PLD, and the scaling of island density was studied regarding the growth for 0MBE growth was observed as t(1) increased. The phase diagram was also presented.

  8. P-type thin films transistors with solution-deposited lead sulfide films as semiconductor

    Energy Technology Data Exchange (ETDEWEB)

    Carrillo-Castillo, A.; Salas-Villasenor, A.; Mejia, I. [Department of Materials Science and Engineering, The University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States); Aguirre-Tostado, S. [Centro de Investigacion en Materiales Avanzados, S. C. Alianza Norte 202, Parque de Investigacion e Innovacion Tecnologica, Apodaca, Nuevo Leon, C.P. 666000 (Mexico); Gnade, B.E. [Department of Materials Science and Engineering, University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States); Quevedo-Lopez, M.A., E-mail: mxq071000@utdallas.edu [Department of Materials Science and Engineering, University of Texas at Dallas. 800 West Campbell Rd, Richardson, TX 75083 (United States)

    2012-01-31

    In this paper we demonstrate p-type thin film transistors fabricated with lead sulfide (PbS) as semiconductor deposited by chemical bath deposition methods. Crystallinity and morphology of the resulting PbS films were characterized using X-ray diffraction, atomic force microscopy and scanning electron microscopy. Devices were fabricated using photolithographic processes in a bottom gate configuration with Au as source and drain top contacts. Field effect mobility for as-fabricated devices was {approx} 0.09 cm{sup 2} V{sup -1} s{sup -1} whereas the mobility for devices annealed at 150 Degree-Sign C/h in forming gas increased up to {approx} 0.14 cm{sup 2} V{sup -1} s{sup -1}. Besides the thermal annealing, the entire fabrications process was maintained below 100 Degree-Sign C. The electrical performance of the PbS-thin film transistors was studied before and after the 150 Degree-Sign C anneal as well as a function of the PbS active layer thicknesses. - Highlights: Black-Right-Pointing-Pointer Thin film transistors with PbS as semiconductor deposited by chemical bath deposition. Black-Right-Pointing-Pointer Photolithography-based thin film transistors with PbS films at low temperatures. Black-Right-Pointing-Pointer Electron mobility for anneal-PbS devices of {approx} 0.14 cm{sup 2} V{sup -1} s{sup -1}. Black-Right-Pointing-Pointer Highest mobility reported in thin film transistors with PbS as the semiconductor.

  9. The Effects of Two Thick Film Deposition Methods on Tin Dioxide Gas Sensor Performance

    OpenAIRE

    Bakrania, Smitesh D.; Margaret S. Wooldridge

    2009-01-01

    This work demonstrates the variability in performance between SnO2 thick film gas sensors prepared using two types of film deposition methods. SnO2 powders were deposited on sensor platforms with and without the use of binders. Three commonly utilized binder recipes were investigated, and a new binder-less deposition procedure was developed and characterized. The binder recipes yielded sensors with poor film uniformity and poor structural integrity, compared to the binder-less deposition meth...

  10. Short review on chemical bath deposition of thin film and characterization

    Energy Technology Data Exchange (ETDEWEB)

    Mugle, Dhananjay, E-mail: dhananjayforu@gmail.com; Jadhav, Ghanshyam, E-mail: ghjadhav@rediffmail.com [Depertment of Physics, Shri Chhatrapati Shivaji College, Omerga-413606 (India)

    2016-05-06

    This reviews the theory of early growth of the thin film using chemical deposition methods. In particular, it critically reviews the chemical bath deposition (CBD) method for preparation of thin films. The different techniques used for characterizations of the chemically films such as X-ray diffractometer (XRD), Scanning electron microscopy (SEM), Transmission electron microscopy (TEM), Electrical conductivity and Energy Dispersive Spectroscopy (EDS) are discussed. Survey shows the physical and chemical properties solely depend upon the time of deposition, temperature of deposition.

  11. Atomic layer deposition ultrathin film origami using focused ion beams

    Science.gov (United States)

    Supekar, O. D.; Brown, J. J.; Eigenfeld, N. T.; Gertsch, J. C.; Bright, V. M.

    2016-12-01

    Focused ion beam (FIB) micromachining is a powerful tool for maskless lithography and in recent years FIB has been explored as a tool for strain engineering. Ion beam induced deformation can be utilized as a means for folding freestanding thin films into complex 3D structures. FIB of high energy gallium (Ga+) ions induces stress by generation of dislocations and ion implantation within material layers, which create creases or folds upon mechanical relaxation enabled by motion of the material layers. One limitation on such processing is the ability to fabricate flat freestanding thin film structures. This capability is limited by the residual stresses formed during processing and fabrication of the films, which can result in initial curvature and deformation of films upon release from a sacrificial fabrication layer. This paper demonstrates folding in freestanding ultrathin films (1:1000) by ion-induced stress relaxation. The ultrathin flat structures are fabricated using atomic layer deposition on sacrificial polyimide. We have demonstrated vertical folding with 30 keV Ga+ ions in structures with lateral dimensions varying from 10 to 50 μm.

  12. Pulsed laser deposition of fluoride glass thin films

    Science.gov (United States)

    Ganser, Dimitri; Gottmann, Jens; Mackens, Uwe; Weichmann, Ulrich

    2010-11-01

    The development of integrated waveguide lasers for different applications such as marking, illumination or medical technology has become highly desirable. Diode pumped planar waveguide lasers emitting in the green visible spectral range, e.g. thin films from praseodymium doped fluorozirconate glass matrix (called ZBLAN, owing to the main components ZrF 4, BaF 2, LaF 3, AlF 3 and NaF) as the active material pumped by a blue laser diode, have aroused great interest. In this work we have investigated the deposition of Pr:ZBLAN thin films using pulsed laser radiation of λ = 193 and λ = 248 nm. The deposition has been carried out on MgF 2 single crystal substrates in a vacuum chamber by varying both processing gas pressure and energy fluence. The existence of an absorption line at 210 nm in Pr:ZBLAN leads to absorption and radiative relaxation of the absorbed laser energy of λ = 193 nm preventing the evaporation of target material. The deposited thin films consist of solidified and molten droplets and irregular particulates only. Furthermore, X-ray radiation has been applied to fluoride glass targets to enhance the absorption in the UV spectral region and to investigate the deposition of X-ray treated targets applying laser radiation of λ = 248 nm. It has been shown that induced F-centres near the target surface are not thermally stable and can be easily ablated. Therefore, λ = 248 nm is not suitable for evaporation of Pr:ZBLAN.

  13. Pulsed laser deposition of fluoride glass thin films

    Energy Technology Data Exchange (ETDEWEB)

    Ganser, Dimitri, E-mail: dimitri.ganser@llt.rwth-aachen.de [Chair for Laser Technology LLT, RWTH Aachen University, Steinbachstr. 15, D-52074 Aachen (Germany); Gottmann, Jens [Chair for Laser Technology LLT, RWTH Aachen University, Steinbachstr. 15, D-52074 Aachen (Germany); Mackens, Uwe; Weichmann, Ulrich [Philips Research Laboratories, Weisshausstrasse 2, D-52066 Aachen (Germany)

    2010-11-15

    The development of integrated waveguide lasers for different applications such as marking, illumination or medical technology has become highly desirable. Diode pumped planar waveguide lasers emitting in the green visible spectral range, e.g. thin films from praseodymium doped fluorozirconate glass matrix (called ZBLAN, owing to the main components ZrF{sub 4}, BaF{sub 2}, LaF{sub 3}, AlF{sub 3} and NaF) as the active material pumped by a blue laser diode, have aroused great interest. In this work we have investigated the deposition of Pr:ZBLAN thin films using pulsed laser radiation of {lambda} = 193 and {lambda} = 248 nm. The deposition has been carried out on MgF{sub 2} single crystal substrates in a vacuum chamber by varying both processing gas pressure and energy fluence. The existence of an absorption line at 210 nm in Pr:ZBLAN leads to absorption and radiative relaxation of the absorbed laser energy of {lambda} = 193 nm preventing the evaporation of target material. The deposited thin films consist of solidified and molten droplets and irregular particulates only. Furthermore, X-ray radiation has been applied to fluoride glass targets to enhance the absorption in the UV spectral region and to investigate the deposition of X-ray treated targets applying laser radiation of {lambda} 248 nm. It has been shown that induced F-centres near the target surface are not thermally stable and can be easily ablated. Therefore, {lambda} = 248 nm is not suitable for evaporation of Pr:ZBLAN.

  14. Resonant Infrared Matrix Assisted Pulsed Laser Deposition of Polymers: Improving the Morphology of As-Deposited Films

    Science.gov (United States)

    Bubb, Daniel; Papantonakis, Michael; Collins, Brian; Brookes, Elijah; Wood, Joshua; Gurudas, Ullas

    2008-03-01

    Resonant infrared matrix assisted pulsed laser deposition has been used to deposit thin films of PMMA, a widely used industrial polymer. This technique is similar to conventional pulsed laser deposition, except that the polymer to be deposited is dissolved in a solvent and the solution is frozen before ablation in a vacuum chamber. The laser wavelength is absorbed by a vibrational band in the frozen matrix. The polymer lands on the substrate to form a film, while the solvent is pumped away. Our preliminary results show that the surface roughness of the as-deposited films depends strongly on the differential solubility radius, as defined by Hansen solubility parameters of the solvent and the solubility radius of the polymer. Our results will be compared with computational and experimental studies of the same polymer using a KrF (248 nm) laser. The ejection mechanism will be discussed as well as the implications of these results for the deposition of smooth high quality films.

  15. Anisotropic high-k deposition for gate-last processing of metal-oxide-semiconductor field-effect transistor utilizing electron-cyclotron-resonance plasma sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Kikuchi, Yoshiaki, E-mail: kikuchi.y.ao@m.titech.ac.jp; Gao, Jun; Sano, Takahiro; Ohmi, Shun-ichiro, E-mail: ohmi@ep.titech.ac.jp

    2012-01-31

    A high-k/metal gate structure has been investigated for application to state-of-the-art metal-oxide-semiconductor field-effect transistors. In the high-k/metal gate structure, the 32-nm technology node was realized by using the high-k-last, metal-last integration process. We investigated anisotropic deposition for 3-dimensional gate structures on Si substrates utilizing electron-cyclotron-resonance plasma sputtering to reduce parasitic capacitance. Anisotropic HfN film deposition was realized and the deposition thickness on the side wall was reduced with decreasing sputtering gas pressure, from 0.15 to 0.06 Pa, corresponding to Ar/N{sub 2} flow ratios of 20/1 and 5/1 sccm. The HfSiON gate insulator formed from the anisotropically deposited HfN film showed an equivalent-oxide-thickness of 2.1 nm and a gate leakage of 3.1 Multiplication-Sign 10{sup -6}A/cm{sup 2} at V{sub FB}-1.0. - Highlights: Black-Right-Pointing-Pointer High-k film deposition was controlled by the deposition pressure. Black-Right-Pointing-Pointer The pressure decreases with a reduction of gas flow rate during the high-k film deposition. Black-Right-Pointing-Pointer A flat band voltage shows negative shifts with reduction of gas flow rates. Black-Right-Pointing-Pointer A reason of the flat band voltage shift is an increase in Si-N bonding.

  16. Chemical bath deposition of indium sulphide thin films: preparation and characterization

    Energy Technology Data Exchange (ETDEWEB)

    Lokhande, C.D.; Ennaoui, A.; Patil, P.S.; Giersig, M.; Diesner, K.; Muller, M.; Tributsch, H. [Hahn-Meitner-Institut Berlin GmbH (Germany). Bereich Physikalische Chemie

    1999-02-26

    Indium sulphide (In{sub 2}S{sub 3}) thin films have been successfully deposited on different substrates under varying deposition conditions using chemical bath deposition technique. The deposition mechanism of In{sub 2}S{sub 3} thin films from thioacetamide deposition bath has been proposed. Films have been characterized with respect to their crystalline structure, composition, optical and electrical properties by means of X-ray diffraction, TEM, EDAX, optical absorption, TRMC (time resolved microwave conductivity) and RBS. Films on glass substrates were amorphous and on FTO (flourine doped tin oxide coated) glass substrates were polycrystalline (element of phase). The optical band gap of In{sub 2}S{sub 3} thin film was estimated to be 2.75 eV. The as-deposited films were photoactive as evidenced by TRMC studies. The presence of oxygen in the film was detected by RBS analysis. (orig.) 27 refs.

  17. Direct current magnetron sputter-deposited ZnO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Hoon, Jian-Wei [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Chan, Kah-Yoong, E-mail: kychan@mmu.edu.my [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Krishnasamy, Jegenathan; Tou, Teck-Yong [Faculty of Engineering, Multimedia University, Persiaran Multimedia, 63100 Cyberjaya, Selangor (Malaysia); Knipp, Dietmar [School of Engineering and Science, Jacobs University Bremen, 28759 Bremen (Germany)

    2011-01-15

    Zinc oxide (ZnO) is a very promising electronic material for emerging transparent large-area electronic applications including thin-film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 150 nm to 750 nm were deposited on glass substrates. The deposition pressure and the substrate temperature were varied from 12 mTorr to 25 mTorr, and from room temperature to 450 deg. C, respectively. The influence of the film thickness, deposition pressure and the substrate temperature on structural and optical properties of the ZnO films was investigated using atomic force microscopy (AFM) and ultraviolet-visible (UV-Vis) spectrometer. The experimental results reveal that the film thickness, deposition pressure and the substrate temperature play significant role in the structural formation and the optical properties of the deposited ZnO thin films.

  18. Effects of increasing nitrogen concentration on the structure of carbon nitride films deposited by ion beam assisted deposition

    OpenAIRE

    Hammer, P.; Victoria, NM; F Alvarez

    2000-01-01

    Amorphous carbon nitride films containing increasing concentrations of nitrogen were deposited by ion beam assisted deposition at a substrate temperature of 150 degrees C. The relationship between the deposition conditions and the chemical bonding structure was investigated by x-ray photoelectron, ultraviolet photoelectron, infrared, and Raman spectroscopies. Film properties were examined by ultraviolet-vis spectroscopy, conductivity, hardness, density, and internal stress measurements. The e...

  19. Induced recrystallization of CdTe thin films deposited by close-spaced sublimation

    Science.gov (United States)

    Moutinho, H. R.; Dhere, R. G.; Al-Jassim, M. M.; Mayo, B.; Levi, D. H.; Kazmerski, L. L.

    1999-03-01

    We have deposited CdTe thin films by close-spaced sublimation at two different temperature ranges. The films deposited at the lower temperature partially recrystallized after CdCl2 treatment at 350 °C and completely recrystallized after the same treatment at 400 °C. The films deposited at higher temperature did not recrystallize at these two temperatures. These results confirmed that the mechanisms responsible for changes in physical properties of CdTe films treated with CdCl2 are recrystallization and grain growth, and provided an alternative method to deposit CSS films using lower temperatures.

  20. Tribological Properties of DLC Film Prepared by C + Ion Beam-assisted Deposition (IBAD)

    Institute of Scientific and Technical Information of China (English)

    2006-01-01

    C + ion beam-assisted deposition was utilized to prepare deposit diamond-like carbon (DLC) film.With the help of a series of experiments such as Raman spectroscopy, FT- IR spectroscopy, AFM and nanoindentation, the DLC film has been recognized as hydrogenated DLC film and its tribological properties have been evaluated.The ball-on-disc testing results show that the hardness and the tribological properties of the DLC film produced by C + ion beam-assisted deposition are improved significandy.DLC film produced by C+ ion beam-assisted deposition is positive to have a prosperous tribological application in the near future.

  1. Induced Recrystallization of CdTe Thin Films Deposited by Close-Spaced Sublimation

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H. R.; Dhere, R. G.; Al-Jassim, M. M.; Levi, D. H.; Kazmerski, L. L. (National Renewable Energy Laboratory); Mayo, B. (Southern University and A& M College, Baton Rouge, LA)

    1998-10-26

    We have deposited CdTe thin films by close-spaced sublimation at two different temperature ranges. The films deposited at the lower temperature partially recrystallized after CdCl2 treatment at 350 C and completely recrystallized after the same treatment at 400 C. The films deposited at higher temperature did not recrystallize at these two temperatures. These results confirmed that the mechanisms responsible for changes in physical properties of CdTe films treated with CdCl2 are recrystallization and grain growth, and provided an alternative method to deposit CSS films using lower temperatures.

  2. Induced Recrystallization of CdTe Thin Films Deposited by Close-Spaced Sublimation

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H. R.; Dhere, R. G.; Al-Jassim, M. M.; Levi, D. H.; Kazmerski, L. L. (National Renewable Energy Laboratory); Mayo, B. (Southern University and A& M College, LA)

    1998-10-29

    We have deposited CdTe thin films by close-spaced sublimation at two different temperature ranges. The films deposited at the lower temperature partially recrystallized after CdCl{sub 2} treatment at 350 C and completely recrystallized after the same treatment at 400 C. The films deposited at higher temperature did not recrystallize at these two temperatures. These results confirmed that the mechanisms responsible for changes in physical properties of CdTe films treated with CdCl{sub 2} are recrystallization and grain growth, and provided an alternative method to deposit CSS films using lower temperatures.

  3. Atomistic study of deposition process of Al thin film on Cu substrate

    Energy Technology Data Exchange (ETDEWEB)

    Cao Yongzhi, E-mail: yzcaohit@gmail.com [Center for Precision Engineering, Harbin Institute of Technology, Harbin (China); Zhang Junjie; Sun Tao; Yan Yongda; Yu Fuli [Center for Precision Engineering, Harbin Institute of Technology, Harbin (China)

    2010-08-01

    In this paper we report molecular dynamics based atomistic simulations of deposition process of Al atoms onto Cu substrate and following nanoindentation process on that nanostructured material. Effects of incident energy on the morphology of deposited thin film and mechanical property of this nanostructured material are emphasized. The results reveal that the morphology of growing film is layer-by-layer-like at incident energy of 0.1-10 eV. The epitaxy mode of film growth is observed at incident energy below 1 eV, but film-mixing mode commences when incident energy increase to 10 eV accompanying with increased disorder of film structure, which improves quality of deposited thin film. Following indentation studies indicate deposited thin films pose lower stiffness than single crystal Al due to considerable amount of defects existed in them, but Cu substrate is strengthened by the interface generated from lattice mismatch between deposited Al thin film and Cu substrate.

  4. Controlled Mechanical Cracking of Metal Films Deposited on Polydimethylsiloxane (PDMS

    Directory of Open Access Journals (Sweden)

    Andreas Polywka

    2016-09-01

    Full Text Available Stretchable large area electronics conform to arbitrarily-shaped 3D surfaces and enables comfortable contact to the human skin and other biological tissue. There are approaches allowing for large area thin films to be stretched by tens of percent without cracking. The approach presented here does not prevent cracking, rather it aims to precisely control the crack positions and their orientation. For this purpose, the polydimethylsiloxane (PDMS is hardened by exposure to ultraviolet radiation (172 nm through an exposure mask. Only well-defined patterns are kept untreated. With these soft islands cracks at the hardened surface can be controlled in terms of starting position, direction and end position. This approach is first investigated at the hardened PDMS surface itself. It is then applied to conductive silver films deposited from the liquid phase. It is found that statistical (uncontrolled cracking of the silver films can be avoided at strain below 35%. This enables metal interconnects to be integrated into stretchable networks. The combination of controlled cracks with wrinkling enables interconnects that are stretchable in arbitrary and changing directions. The deposition and patterning does not involve vacuum processing, photolithography, or solvents.

  5. Substrate heating measurements in pulsed ion beam film deposition

    Energy Technology Data Exchange (ETDEWEB)

    Olson, J.C.; Davis, H.A.; Rej, D.J.; Waganaar, W.J. [Los Alamos National Lab., NM (United States); Tallant, D.R. [Cornell Univ., Ithaca, NY (United States). Materials Science and Engineering Dept.; Thompson, M.O. [Sandia National Labs., Albuquerque, NM (United States)

    1995-05-01

    Diamond-like Carbon (DLC) films have been deposited at Los Alamos National Laboratory by pulsed ion beam ablation of graphite targets. The targets were illuminated by an intense beam of hydrogen, carbon, and oxygen ions at a fluence of 15-45 J/cm{sup 2}. Ion energies were on the order of 350 keV, with beam current rising to 35 kA over a 400 ns ion current pulse. Raman spectra of the deposited films indicate an increasing ratio of sp{sup 3} to sp{sup 2} bonding as the substrate is moved further away from the target and further off the target normal. Using a thin film platinum resistor at varying positions, we have measured the heating of the substrate surface due to the kinetic energy and heat of condensation of the ablated material. This information is used to determine if substrate heating is responsible for the lack of DLC in positions close to the target and near the target normal. Latest data and analysis will be presented.

  6. Electroless deposition, post annealing and characterization of nickel films on silicon

    Indian Academy of Sciences (India)

    Subir Sabharwal; Siddharth Palit; R B Tokas; A K Poswal; Sangeeta

    2008-10-01

    Electroless deposition of nickel (EN) films on -type silicon has been investigated under different process conditions. The interface between the film and substrate has been characterized for electrical properties by probing the contact resistances. X-ray diffraction and atomic force microscopy have been performed to obtain information about the structural and morphological details of the films. As a comparative study, nickel films have also been sputter deposited on silicon substrates. An as-deposited electroless film is observed to form non-ohmic contact while in a sputtered film prepared without the application of substrate heating, the formation of metal–insulating–semiconductor type junction is seen.

  7. Pulsed laser deposition of permanent magnetic Nd2Fe14B thin films

    NARCIS (Netherlands)

    Geurtsen, A.J.M.; Kools, J.C.S.; Wit, L.; Lodder, J.C.

    1996-01-01

    Pulsed Laser Deposition (PLD) is applied to deposit thin (thickness typically 100 nm) films of Nd2Fe14B. It is shown that films can be grown which have the desired composition and phase. Nd2Fe14B grows with the c-axis along the film normal on 110 Al2O3 single crystal substrates covered with a Ta lay

  8. Pulsed laser deposition of Cu-Sn-S for thin film solar cells

    DEFF Research Database (Denmark)

    Ettlinger, Rebecca Bolt; Crovetto, Andrea; Bosco, Edoardo

    Thin films of copper tin sulfide were deposited from a target of the stoichiometry Cu:Sn:S ~1:2:3 using pulsed laser deposition (PLD). Annealing with S powder resulted in films close to the desired Cu2SnS3 stoichiometry although the films remained Sn rich. Xray diffraction showed that the final...

  9. Pure and Sn-doped ZnO films produced by pulsed laser deposition

    DEFF Research Database (Denmark)

    Holmelund, E.; Schou, Jørgen; Tougaard, S.;

    2002-01-01

    A new technique, metronome doping, has been used for doping of films during pulsed laser deposition (PLD). This technique makes it possible to dope continuously during film growth with different concentrations of a dopant in one deposition sequence. Films of pure and doped ZnO have been produced...

  10. Deposition of highly (111)-oriented PZT thin films by using metal organic chemical deposition

    CERN Document Server

    Bu, K H; Choi, D K; Seong, W K; Kim, J D

    1999-01-01

    Lead zirconate titanate (PZT) thin films have been grown on Pt/Ta/SiNx/Si substrates by using metal organic chemical vapor deposition with Pb(C sub 2 H sub 5) sub 4 , Zr(O-t-C sub 4 H sub 9) sub 4 , and Ti(O-i-C sub 3 H sub 7) sub 4 as source materials and O sub 2 as an oxidizing gas. The Zr fraction in the thin films was controlled by varying the flow rate of the Zr source material. The crystal structure and the electrical properties were investigated as functions of the composition. X-ray diffraction analysis showed that at a certain range of Zr fraction, highly (111)-oriented PZT thin films with no pyrochlore phases were deposited. On the other hand, at low Zr fractions, there were peaks from Pb-oxide phases. At high Zr fractions, peaks from pyrochlore phase were seen. The films also showed good electrical properties, such as a high dielectric constant of more than 1200 and a low coercive voltage of 1.35 V.

  11. Properties of HfAlO film deposited by plasma enhanced atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Cao, Duo [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China); Cheng, Xinhong, E-mail: xh_cheng@mail.sim.ac.cn [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China); Jia, Tingting; Zheng, Li; Xu, Dawei; Wang, Zhongjian; Xia, Chao; Yu, Yuehui [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Changning Road 865, Shanghai 200050 (China)

    2013-07-15

    Plasma enhanced atomic layer deposition (PEALD) method can reduce film growing temperature, and allow in situ plasma treatment. In this work, HfAlO and HfO{sub 2} films were deposited with PEALD at 160 °C. Microstructure analysis showed that both films were amorphous after rapid thermal annealing (RTA) treatment, and HfAlO sample showed better interfacial structure than HfO{sub 2}. X-ray photoelectron spectroscopy (XPS) spectra indicated that main component of the interfacial layer of HfAlO sample was Hf–Si–O and Al–Si–O bonds, the valence band offset value between the HfAlO film and Si substrate was calculated to be 2.5 eV. The dominant leakage current mechanism of the samples was Schottky emission at a low electric field (<1.4 MV/cm), and Poole–Frenkel emission mechanism at a higher electric field (>1.4 MV/cm). The equivalent oxide thicknesses (EOT) of the HfAlO samples were 1.0 nm and 1.3 nm, respectively. The density of interface states between dielectric and substrate were calculated to be 1.2 × 10{sup 12} eV{sup −1}cm{sup −2} and 1.3 × 10{sup 12} eV{sup −1}cm{sup −2}, respectively. In comparison with HfO{sub 2} film, HfAlO film has good interfacial structure and electrical performance.

  12. Vapor deposition of polystyrene thin films by intense laser vibrational excitation

    DEFF Research Database (Denmark)

    Bubb, D.M.; Papantonakis, M.R.; Horwitz, J.S.

    2002-01-01

    Polystyrene films were deposited using resonant infrared pulsed laser depositions (RIR-PLD). Thin films were grown on Si(1 1 1) wafers and NaCl substrates and analyzed by Fourier transform infrared spectroscopy (FTIR) and gel permeation chromatography (GPC). The depositions were carried out...

  13. Properties of alumina films by atmospheric pressure metal-organic chemical vapour deposition

    NARCIS (Netherlands)

    Haanappel, V.A.C.; Corbach, van H.D.; Fransen, T.; Gellings, P.J.

    1994-01-01

    Thin alumina films were deposited at low temperatures (290–420°C) on stainless steel, type AISI 304. The deposition process was carried out in nitrogen by metal-organic chemical vapour deposition using aluminum tri-sec-butoxide. The film properties including the protection of the underlying substrat

  14. Study of Nanocrystalline Diamond Film Deposited Rapidly by 500 W Excimer Laser

    Institute of Scientific and Technical Information of China (English)

    PENG Hongyan; SHEN Jiajing; YANG Guilong

    2000-01-01

    High quality nanocrystalline diamond film deposited rapidly by an XeCl excimer laser operated at high laser power (500 W) and repetition rate (300~500 Hz) is presented. A high deposition rate, 250 nm/thousand pulses, was obtained. The effects of laser energy fluence and repetition rate on the deposition of diamond film were investigated.

  15. The spatial thickness distribution of metal films produced by large area pulsed laser deposition

    DEFF Research Database (Denmark)

    Pryds, Nini; Schou, Jørgen; Linderoth, Søren

    2007-01-01

    Thin films of metals have been deposited in the large-area Pulsed Laser Deposition (PLD) Facility at Riso National Laboratory. Thin films of Ag and Ni were deposited with laser pulses from an excimer laser at 248 nm with a rectangular beam spot at a fluence of 10 J/cm(2) on glass substrates of 12...

  16. Phase change properties of Ti-Sb-Te thin films deposited by thermal atomic layer deposition

    Science.gov (United States)

    Song, Sannian; Shen, Lanlan; Song, Zhitang; Yao, Dongning; Guo, Tianqi; Li, Le; Liu, Bo; Wu, Liangcai; Cheng, Yan; Ding, Yuqiang; Feng, Songlin

    2016-10-01

    Phase change random access memory (PCM) appears to be the strongest candidate for next-generation high density nonvolatile memory. The fabrication of ultrahigh density PCM depends heavily on the thin film growth technique for the phase changing chalcogenide material. In this study, TiSb2Te4 (TST) thin films were deposited by thermal atomic layer deposition (ALD) method using TiCl4, SbCl3, (Et3Si)2Te as precursors. The threshold voltage for the cell based on thermal ALD-deposited TST is about 2.0 V, which is much lower than that (3.5 V) of the device based on PVD-deposited Ge2Sb2Te5 (GST) with the identical cell architecture. Tests of TST-based PCM cells have demonstrated a fast switching rate of 100 ns. Furthermore, because of the lower melting point and thermal conductivities of TST materials, TST-based PCM cells exhibit 19% reduction of pulse voltages for Reset operation compared with GST-based PCM cells. These results show that thermal ALD is an attractive method for the preparation of phase change materials.

  17. Verification of cell irradiation dose deposition using a radiochromic film

    Energy Technology Data Exchange (ETDEWEB)

    Tomic, N [Department of Radiation Oncology, Jewish General Hospital, McGill University, Montreal, Quebec (Canada); Gosselin, M [Department of Radiation Oncology, Jewish General Hospital, McGill University, Montreal, Quebec (Canada); Wan, Jonathan F [Radiation Oncology Department, McGill University Health Centre, Montreal, Quebec (Canada); Saragovi, Uri [Department of Pharmacology, McGill University, Montreal, Quebec (Canada); Podgorsak, E B [Medical Physics Department, McGill University Health Center, Montreal, Quebec (Canada); Evans, M [Medical Physics Department, McGill University Health Center, Montreal, Quebec (Canada); Devic, S [Medical Physics Department, McGill University Health Center, Montreal, Quebec (Canada)

    2007-06-07

    We describe a technique for the MTT assay that irradiates all cells at once by a combination of couch movement and a step-and-shoot irradiation technique on a linear accelerator with 6 MV and 18 MV photon beams. In two experimental setups, we obtained maximum to minimum dose ranges of 10 for the constant MU/bin (monitor units per bin) setup and 20 for the variable MU/bin technique. The irradiation technique described is dose rate independent and it can be used on any teletherapy irradiation machine. We also employed radiochromic film dosimetry to verify dose delivered in each of the wells within the dish. It is shown that for the lowest doses, relative dose variation within wells reaches a value of 6%. We also demonstrated that the radiochromic film positioned below the 96-well plate does not underestimate dose deposited within each compartment by more than 2% due to the vertical dose gradient.

  18. Verification of cell irradiation dose deposition using a radiochromic film

    Science.gov (United States)

    Tomic, N.; Gosselin, M.; Wan, Jonathan F.; Saragovi, Uri; Podgorsak, E. B.; Evans, M.; Devic, S.

    2007-06-01

    We describe a technique for the MTT assay that irradiates all cells at once by a combination of couch movement and a step-and-shoot irradiation technique on a linear accelerator with 6 MV and 18 MV photon beams. In two experimental setups, we obtained maximum to minimum dose ranges of 10 for the constant MU/bin (monitor units per bin) setup and 20 for the variable MU/bin technique. The irradiation technique described is dose rate independent and it can be used on any teletherapy irradiation machine. We also employed radiochromic film dosimetry to verify dose delivered in each of the wells within the dish. It is shown that for the lowest doses, relative dose variation within wells reaches a value of 6%. We also demonstrated that the radiochromic film positioned below the 96-well plate does not underestimate dose deposited within each compartment by more than 2% due to the vertical dose gradient.

  19. Comparison of the properties of Pb thin films deposited on Nb substrate using thermal evaporation and pulsed laser deposition techniques

    Energy Technology Data Exchange (ETDEWEB)

    Perrone, A., E-mail: alessio.perrone@unisalento.it [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); INFN-Istituto Nazionale di Fisica Nucleare e Università del Salento, 73100 Lecce (Italy); Gontad, F. [INFN-Istituto Nazionale di Fisica Nucleare e Università del Salento, 73100 Lecce (Italy); Lorusso, A.; Di Giulio, M. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Broitman, E. [Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-581 83 Linköping (Sweden); Ferrario, M. [Laboratori Nazionali di Frascati, Istituto Nazionale di Fisica Nucleare, 00044 Frascati (Italy)

    2013-11-21

    Pb thin films were prepared at room temperature and in high vacuum by thermal evaporation and pulsed laser deposition techniques. Films deposited by both the techniques were investigated by scanning electron microscopy to determine their surface topology. The structure of the films was studied by X-ray diffraction in θ–2θ geometry. The photoelectron performances in terms of quantum efficiency were deduced by a high vacuum photodiode cell before and after laser cleaning procedures. Relatively high quantum efficiency (>10{sup −5}) was obtained for all the deposited films, comparable to that of corresponding bulk. Finally, film to substrate adhesion was also evaluated using the Daimler–Benz Rockwell-C adhesion test method. Weak and strong points of these two competitive techniques are illustrated and discussed. -- Highlights: •Comparison of Pb thin films deposited on Nb substrate by thermal evaporation and pulsed laser deposition (PLD). •Photoelectron performances of Pb thin films. •Good quality of adhesion strength of Pb films deposited by PLD.

  20. Dependence of electro-optical properties on the deposition conditions of chemical bath deposited CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Dona, J.M.; Herrero, J. [CIEMAT, Madrid (Spain). Inst. de Energias Renovables

    1997-11-01

    Lately, there has been a sharp increase in the publication of papers on chemical bath deposition of CdS thin films and related materials due to successful results obtained using this method to fabricate CdS thin-film buffer layers for CuInSe{sub 2}- and CdTe-based polycrystalline thin-film solar cells. Generally, these papers focus on previously proposed methods of studying film characteristics without a systematic study of the influence of deposition conditions on film characteristics. In this paper the authors present an exhaustive study of the chemical bath-deposited CdS thin films electro-optical properties dependence on deposition variables. The authors propose not only a set of conditions for obtaining CdS thin films by this method but additionally, suitable deposition process conditions for certain application requirements, such as buffer layers for thin-film solar cells. The observed electro-optical characteristics dependence on the deposition variables corroborates the chemical mechanism that they proposed previously for this process.

  1. Hydrogenated Silicon Carbide Thin Films Prepared with High Deposition Rate by Hot Wire Chemical Vapor Deposition Method

    Directory of Open Access Journals (Sweden)

    M. M. Kamble

    2014-01-01

    Full Text Available Structural, optical, and electrical properties of hydrogenated silicon carbide (SiC:H films, deposited from silane (SiH4 and methane (CH4 gas mixture by HW-CVD method, were investigated. Film properties are carefully and systematically studied as function of deposition pressure which is varied between 200 mTorr and 500 mTorr. The deposition rate is found to be reasonably high (9.4 nm/s films is confirmed by FTIR, Raman, and XPS analysis. XRD and Raman analysis revealed that with increasing deposition pressure amorphization occurs in SiC:H films. FTIR spectroscopy analysis shows that bond density of C–H decreases while Si–C and Si–H bond densities increase with increasing deposition pressure. Total hydrogen content increases with increasing deposition pressure and was found to be <20 at.%. The absence of band ~1300–1600 cm−1 in the Raman spectra implies negligible C–C bond concentration and formation of nearly stoichiometric SiC:H films. The band gap shows increasing trend with increasing deposition pressure. The high value of Urbach energy suggests increased structural disorder in SiC:H films. Finally, it has been concluded that CH4 can be used as effective carbon source in HW-CVD method to prepare stoichiometric SiC:H films.

  2. A Comparison between Thin-Film Transistors Deposited by Hot-Wire Chemical Vapor Deposition and PECVD

    Directory of Open Access Journals (Sweden)

    Meysam Zarchi

    2015-03-01

    Full Text Available The effect of new growth techniques on the mobility and stability of amorphous silicon (a-Si:H thin film transistors (TFTs has been studied. It was suggested that the key parameter controlling the field-effect mobility and stability is the intrinsic stress in the a-Si:H layer. Amorphous and microcrystalline silicon films were deposited by radiofrequency plasma enhanced chemical vapor deposition (RF-PECVD and hot-wire chemical vapor deposition (HW-CVD at 100 ºC and 25 ºC. Structural properties of these films were measured by Raman Spectroscopy. Electronic properties were measured by dark conductivity, σd, and photoconductivity, σph. For amorphous silicon films deposited by RF-PECVD on PET, photosensitivity's of >105 were obtained at both 100 º C and 25 ºC. For amorphous silicon films deposited by HW-CVD, a photosensitivity of > 105 was obtained at 100 ºC. Microcrystalline silicon films deposited by HW-CVD at 95% hydrogen dilution show σph~ 10-4 Ω-1cm-1, while maintaining a photosensitivity of ~102 at both 100 ºC and 25 ºC. Microcrystalline silicon films with a large crystalline fraction (> 50% can be deposited by HW-CVD all the way down to room temperature.

  3. Growth of Ge films by cluster beam deposition

    CERN Document Server

    Xu, J L; Feng, J Y

    2002-01-01

    Ge epitaxial layers with reasonable quality were grown on the Si(1 1 1) substrates by cluster beam deposition (CBD) process. The growth temperature plays a dominant role in the epitaxial growth of Ge films. The substrate temperature for epitaxial growth is about 500 deg. C, which is lower than the reported critical temperature of Ge epitaxial growth by MBE and CVD. A stress induced phase transition of Ge lattice from cubic to tetragonal is also observed in the CBD process, and the mechanism is discussed.

  4. Mobility activation in thermally deposited CdSe thin films

    Indian Academy of Sciences (India)

    Kangkan Sarmah; Ranjan Sarma

    2009-08-01

    Effect of illumination on mobility has been studied from the photocurrent decay characteristics of thermally evaporated CdSe thin films deposited on suitably cleaned glass substrate held at elevated substrate temperatures. The study indicates that the mobilities of the carriers of different trap levels are activated due to the energy of incident illumination, which results in the existence of two distinct trap levels. In each trap depth the energy of the trap increases linearly. It infers that there is a linear distribution of traps of different energies below the conduction band.

  5. Competing magnetic anisotropies in obliquely deposited thin permalloy film

    Energy Technology Data Exchange (ETDEWEB)

    Belyaev, B.A. [Siberian Federal University, 79, pr. Svobodnyi, Krasnoyarsk 660041 (Russian Federation); Kirensky Institute of Physics, Siberian Branch of the Russian Academy of Sciences, 50/38, Akademgorodok, Krasnoyarsk 660036 (Russian Federation); Reshetnev Siberian State Aerospace University, 31, pr. Imeni Gazety “Krasnoyarskii Rabochii”, Krasnoyarsk 660014 (Russian Federation); Izotov, A.V. [Siberian Federal University, 79, pr. Svobodnyi, Krasnoyarsk 660041 (Russian Federation); Kirensky Institute of Physics, Siberian Branch of the Russian Academy of Sciences, 50/38, Akademgorodok, Krasnoyarsk 660036 (Russian Federation); Solovev, P.N., E-mail: platon.solovev@gmail.com [Siberian Federal University, 79, pr. Svobodnyi, Krasnoyarsk 660041 (Russian Federation)

    2016-01-15

    Distribution of the magnetic anisotropy in thin film prepared by thermal vacuum oblique deposition of permalloy with small off-normal angle of incident in the presence of an external magnetic field has been studied by ferromagnetic resonance technique. On local area of the sample, a mutual compensation of near orthogonal in-plane uniaxial magnetic anisotropies induced by oblique deposition and by applied magnetic field has been found. Moreover, in addition to the uniaxial (twofold) magnetic anisotropy, fourfold and sixfold magnetic anisotropies have been observed in the sample. To explain the obtained high-order anisotropies, we assumed that the sample has exchange coupled adjacent regions or phases with different parameters of magnetic anisotropy. The results of the micromagnetic analysis of a two-layer model of the sample confirm the hypothesis.

  6. Nano-oxide thin films deposited via atomic layer deposition on microchannel plates.

    Science.gov (United States)

    Yan, Baojun; Liu, Shulin; Heng, Yuekun

    2015-01-01

    Microchannel plate (MCP) as a key part is a kind of electron multiplied device applied in many scientific fields. Oxide thin films such as zinc oxide doped with aluminum oxide (ZnO:Al2O3) as conductive layer and pure aluminum oxide (Al2O3) as secondary electron emission (SEE) layer were prepared in the pores of MCP via atomic layer deposition (ALD) which is a method that can precisely control thin film thickness on a substrate with a high aspect ratio structure. In this paper, nano-oxide thin films ZnO:Al2O3 and Al2O3 were prepared onto varied kinds of substrates by ALD technique, and the morphology, element distribution, structure, and surface chemical states of samples were systematically investigated by scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoemission spectroscopy (XPS), respectively. Finally, electrical properties of an MCP device as a function of nano-oxide thin film thickness were firstly studied, and the electrical measurement results showed that the average gain of MCP was greater than 2,000 at DC 800 V with nano-oxide thin film thickness approximately 122 nm. During electrical measurement, current jitter was observed, and possible reasons were preliminarily proposed to explain the observed experimental phenomenon.

  7. Reaction network analysis for thin film deposition processes

    Science.gov (United States)

    Ramakrishnasubramanian, Krishnaprasath

    Understanding the growth of thin films produced by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) has been one of the most important challenge for surface chemists over the last two to three decades. There has been a lack of complete understanding of the surface chemistry behind these systems due to the dearth of experimental reaction kinetics data available. The data that do exist are generally derived through quantum computations. Thus, it becomes ever so important to develop a deposition model which not only predicts the bulk film chemistry but also explains its self-limiting nature and growth surface stability without the use of reaction rate data. The reaction network analysis tools developed in this thesis are based on a reaction factorization approach that aims to decouple the reaction rates by accounting for the chemical species surface balance dynamic equations. This process eliminates the redundant dynamic modes and identifies conserved modes as reaction invariants. The analysis of these invariants is carried out using a Species-Reaction (S-R) graph approach which also serves to simplify the representation of the complex reaction network. The S-R graph is self explanatory and consistent for all systems. The invariants can be easily extracted from the S-R graph by following a set of straightforward rules and this is demonstrated for the CVD of gallium nitride and the ALD of gallium arsenide. We propose that understanding invariants through these S-R graphs not only provides us with the physical significance of conserved modes but also give us a better insight into the deposition mechanism.

  8. Mechanical Properties and Thermal Stability of TiN/Ta Multilayer Film Deposited by Ion Beam Assisted Deposition

    Directory of Open Access Journals (Sweden)

    Hongfei Shang

    2014-01-01

    Full Text Available TiN/Ta multilayer film with a modulation period of 5.6 nm and modulation ratio of 1 : 1 was produced by ion beam assisted deposition. Microstructure of the as-deposited TiN/Ta multilayer film was observed by transmission electron microscopy and mechanical properties were investigated. Residual stress in the TiN/Ta multilayer film was about 72% of that of a TiN monolayer film with equivalent thickness deposited under the same conditions. Partial residual stress was released in the Ta sublayers during deposition, which led to the decrease of the residual stress of the TiN/Ta multilayer film. Nanohardness (H of the TiN/Ta multilayer film was 24 GPa, 14% higher than that of the TiN monolayer film. It is suggested that the increase of the nanohardness is due to the introduction of the Ta layers which restrained the growth of TiN crystal and led to the decrease of the grain size. A significant increase (3.5 times of the H3/E2 (E elastic modulus value indicated that the TiN/Ta multilayer film has higher elasticity than the TiN monolayer film. The Lc (critical load in nano-scratch test value of the TiN monolayer film was 45 mN, which was far lower than that of the TiN/Ta multilayer film (around 75 mN. Results of the indentation test showed a higher fracture toughness of the TiN/Ta multilayer film than that of the TiN monolayer film. Results of differential scanning calorimetric (DSC and thermo gravimetric analysis (TGA indicate that the TiN/Ta multilayer film has better thermal stability than the TiN monolayer film.

  9. Atomic layer deposition of copper sulfide thin films

    Energy Technology Data Exchange (ETDEWEB)

    Schneider, Nathanaelle, E-mail: n.schneider@chimie-paristech.fr; Lincot, Daniel; Donsanti, Frédérique

    2016-02-01

    Atomic Layer Deposition (ALD) of copper sulfide (Cu{sub x}S) thin films from Cu(acac){sub 2} (acac = acetylacetonate = 2,4-pentanedionate) and H{sub 2}S as Cu and S precursors is reported. Typical self-saturated reactions (“ALD window”) are obtained in the temperature range T{sub dep} = 130–200 °C for an average growth per cycle (GR) = 0.25 Å/cycle. The morphology, crystallographic structure, chemical composition, electrical properties and optical band gap of thin films were investigated using scanning electronic microscopy (SEM), X-ray diffraction under Grazing Incidence conditions (GI-XRD), X-ray reflectivity (XRR), energy dispersive spectrometry (EDS), Hall effect measurements, and UV–vis spectroscopy. The obtained copper sulfide films are heavily p-doped (charge carrier concentration ~ 10{sup 21} –10{sup 22} cm{sup −3}) with optical band gaps in the range of 2.2–2.5 eV for direct and 1.6–1.8 eV for indirect band gaps. Depending on the number of ALD cycles, multiphase compounds (made of digenite Cu{sub 1.8}S, chalcocite Cu{sub 2}S, djurleite Cu{sub 31}S{sub 16} and covellite CuS) or single-phase digenite Cu{sub 1.8}S films are obtained via a growth mechanism that involves in-situ copper reduction and loss of sulfur by evaporation. - Highlights: • Cu{sub x}S films were synthesized by atomic layer deposition from Cu(acac){sub 2} and H{sub 2}S. • Self-saturated reactions at T{sub dep} = 130–200 °C for growth = 0.25 Å/cycle • Multi- or single- phase films are obtained depending on the number of cycles. • Growth mechanism involves copper reduction and loss of sulfur by evaporation.

  10. Investigation of polycrystalline CdTe thin films deposited by physical vapor deposition, close-spaced sublimation, and sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H.R.; Hasoon, F.S.; Abulfotuh, F.; Kazmerski, L.L. [National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)

    1995-11-01

    CdTe thin films, deposited on different substrate structures by physical vapor deposition, sputtering, and close-spaced sublimation, have been treated with CdCl{sub 2} at several temperatures. The morphology of the films has been studied by atomic force microscopy, and the observations were correlated to results obtained from x-ray diffraction, cathodoluminescence, and minority-carrier lifetime measurements. The samples treated at 400 {degree}C resulted in the best device-quality films, independent of deposition method and underlying substrate structure. For the first time, a nanograin structure was observed in CdTe sputtered samples. copyright {ital 1995} {ital American} {ital Vacuum} {ital Society}.

  11. High quality plasma-enhanced chemical vapor deposited silicon nitride films

    Energy Technology Data Exchange (ETDEWEB)

    Cotler, T.J.; Chapple-Sokol, J. (IBM General Technology Division, Hopewell Junction, NY (United States))

    1993-07-01

    The qualities of plasma-enhanced chemical vapor deposited (PECVD) silicon nitride films can be improved by increasing the deposition temperature. This report compares PECVD silicon nitride films to low pressure chemical vapor deposited (LPCVD) films. The dependence of the film properties on process parameters, specifically power and temperature, are investigated. The stress is shown to shift from tensile to compressive with increasing temperature and power. The deposition rate, uniformity, wet etch rate, index of refraction, composition, stress, hydrogen content, and conformality are considered to evaluate the film properties. Temperature affects the hydrogen content in the films by causing decreased incorporation of N-H containing species whereas the dependence on power is due to changes in the gas-phase precursors. All PECVD film properties, with the exception of conformality, are comparable to those of LPCVD films.

  12. Influence of deposition parameters on the properties of CdTe films deposited by close spaced sublimation

    OpenAIRE

    Falcão Vivienne Denise; Pinheiro Wagner Anacleto; Ferreira Carlos Luiz; Cruz Leila Rosa de Oliveira

    2006-01-01

    CdTe thin films are used as absorber layer in CdS/CdTe solar cells. The microstructure of this absorber layer plays a fundamental role in photovoltaic conversion and can be controlled by the deposition parameters used during the film growth. In this work, CdTe thin films were deposited by the CSS method onto glass substrates previously covered with In2O3:Sn. The effects of pressure, source temperature and substrate temperature on the microstructural properties of the films were studied. The p...

  13. Morphology and structural studies of WO3 films deposited on SrTiO3 by pulsed laser deposition

    Science.gov (United States)

    Kalhori, Hossein; Porter, Stephen B.; Esmaeily, Amir Sajjad; Coey, Michael; Ranjbar, Mehdi; Salamati, Hadi

    2016-12-01

    WO3 films have been grown by pulsed laser deposition on SrTiO3 (001) substrates. The effects of substrate temperature, oxygen partial pressure and energy fluence of the laser beam on the physical properties of the films were studied. Reflection high-energy electron diffraction (RHEED) patterns during and after growth were used to determine the surface structure and morphology. The chemical composition and crystalline phases were obtained by XPS and XRD respectively. AFM results showed that the roughness and skewness of the films depend on the substrate temperature during deposition. Optimal conditions were determined for the growth of the highly oriented films.

  14. Piezoelectric film electro-deposition for optical fiber sensor with ZnO coating

    Institute of Scientific and Technical Information of China (English)

    Li Zhou; Ping Gu; Ya Zhou

    2008-01-01

    The piezoelectric film electro-deposition for optical fiber sensor with ZnO coating is studied. The zinc oxide plating film is made on the copper surface directly by cathodic electro-deposition in the Zn(NO3)2 single salt aqueous solution systems. The influences of main experimental conditions on the properties of ZnO thin film in the electro-deposition processes are analyzed and a stable, practical and economic technique is obtained.

  15. Ion beam sputter deposition of Ge films: Influence of process parameters on film properties

    Energy Technology Data Exchange (ETDEWEB)

    Bundesmann, C., E-mail: carsten.bundesmann@iom-leipzig.de [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Feder, R. [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Wunderlich, R.; Teschner, U.; Grundmann, M. [Universität Leipzig, Fakultät für Physik und Geowissenschaften, Institut für Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig (Germany); Neumann, H. [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany)

    2015-08-31

    Several sets of Ge films were grown by ion beam sputter deposition under systematic variation of ion beam parameters (ion species and ion energy) and geometrical parameters (ion incidence angle and polar emission angle). The films were characterized concerning thickness, growth rate, mass density, structural properties and composition. The film thicknesses show a cosine-like angular distribution, and the growth rates were found to increase with increasing ion incidence angle and ion energy. All films are amorphous and the average mass density was found to be (4.3 ± 0.2) g/cm{sup 3}, without a systematic relation to ion energy and geometrical parameters. Slightly higher mass densities were found for Ge films grown by sputtering with Xe than for sputtering with Ar. The Ge films contain a fraction of inert gas atoms from backscattered primary particles. This fraction is found to be higher for sputtering with Ar than for sputtering with Xe. The fraction of inert gas atoms increases with increasing polar emission angle and increasing ion incidence angle. Raman scattering experiments revealed also systematic shifts of the characteristic Raman mode. The shifts are tentatively assigned to the change of the Ge particle densities caused by the incorporation of inert gas particles. There seem to be also slight changes in short range ordering. The experimental data are discussed with respect to the known energy and angular distributions of the sputtered and backscattered particles. - Highlights: • Ion beam sputter deposition under systematic variation of process parameters • Thickness, growth rate, mass density, composition, structure, phonon properties • All germanium films are amorphous with small variations in mass density. • Incorporation of considerable amount of inert process gas • Vibrational properties correlate with composition.

  16. Pulsed laser deposition growth of FeSb2 films for thermoelectric applications

    DEFF Research Database (Denmark)

    Sun, Ye; Canulescu, Stela; Sun, Peijie

    2011-01-01

    FeSb2 films were produced in a low-pressure Ar environment by pulsed laser deposition at 355 nm. The influence of growth parameters such as substrate temperature, Ar pressure and deposition time on the growth of FeSb2 films was studied. Nearly phase-pure FeSb2 films with thicknesses of 100–400 nm...... properties of FeSb2 films if they are to eventually reach thermoelectric applications at cryogenic temperatures....

  17. Characterisation of Pb thin films prepared by the nanosecond pulsed laser deposition technique for photocathode application

    OpenAIRE

    Lorusso, Antonella; Gontad, F.; Broitman, Esteban; Chiadroni, E.; Perrone, Walter

    2015-01-01

    Pb thin films were prepared by the nanosecond pulsed laser deposition technique on Si (100) and polycrystalline Nb substrates for photocathode application. As the photoemission performances of a cathode are strongly affected by its surface characteristics, the Pb films were grown at different substrate temperatures with the aim of modifying the morphology and structure of thin films. An evident morphological modification in the deposited films with the formation of spherical grains at higher ...

  18. XPS analysis and luminescence properties of thin films deposited by the pulsed laser deposition technique

    Science.gov (United States)

    Dolo, J. J.; Swart, H. C.; Coetsee, E.; Terblans, J. J.; Ntwaeaborwa, O. M.; Dejene, B. F.

    2010-04-01

    This paper presents the effect of substrate temperature and oxygen partial pressure on the photoluminescence (PL) intensity of the Gd2O2S:Tb3 + thin films that were grown by using pulsed laser deposition (PLD). The PL intensity increased with an increase in the oxygen partial pressure and substrate temperature. The thin film deposited at an oxygen pressure of 900 mTorr and substrate temperature of 900°C was found to be the best in terms of the PL intensity of the Gd2O2S:Tb3 + emission. The main emission peak due to the 5D4-7F5 transition of Tb was measured at a wavelength of 545 nm. The stability of these thin films under prolonged electron bombardment was tested with a combination of techniques such as X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and Cathodoluminescence (CL) spectroscopy. It was shown that the main reason for the degradation in luminescence intensity under electron bombardment is the formation of a non-luminescent Gd2O3 layer, with small amounts of Gd2S3, on the surface.

  19. Influence of deposition parameters on the properties of CdTe films deposited by close spaced sublimation

    Directory of Open Access Journals (Sweden)

    Vivienne Denise Falcão

    2006-03-01

    Full Text Available CdTe thin films are used as absorber layer in CdS/CdTe solar cells. The microstructure of this absorber layer plays a fundamental role in photovoltaic conversion and can be controlled by the deposition parameters used during the film growth. In this work, CdTe thin films were deposited by the CSS method onto glass substrates previously covered with In2O3:Sn. The effects of pressure, source temperature and substrate temperature on the microstructural properties of the films were studied. The properties were mainly influenced by the pressure, the presence of oxygen in the reaction chamber, and the substrate temperature. For films deposited under an argon atmosphere, an increase in grain size and a reduction of the texture were observed as the pressure and substrate temperature were increased. The introduction of oxygen in the atmosphere led to a decrease in the deposition rate and affected the microstructure and composition of the film. Films deposited under an argon-oxygen atmosphere have smaller grains than those deposited under argon and are richer in Te. The addition of oxygen to the atmosphere apparently did not result in the formation of oxides.

  20. Low temperature deposition of polycrystalline silicon thin films on a flexible polymer substrate by hot wire chemical vapor deposition

    Science.gov (United States)

    Lee, Sang-hoon; Jung, Jae-soo; Lee, Sung-soo; Lee, Sung-bo; Hwang, Nong-moon

    2016-11-01

    For the applications such as flexible displays and solar cells, the direct deposition of crystalline silicon films on a flexible polymer substrate has been a great issue. Here, we investigated the direct deposition of polycrystalline silicon films on a polyimide film at the substrate temperature of 200 °C. The low temperature deposition of crystalline silicon on a flexible substrate has been successfully made based on two ideas. One is that the Si-Cl-H system has a retrograde solubility of silicon in the gas phase near the substrate temperature. The other is the new concept of non-classical crystallization, where films grow by the building block of nanoparticles formed in the gas phase during hot-wire chemical vapor deposition (HWCVD). The total amount of precipitation of silicon nanoparticles decreased with increasing HCl concentration. By adding HCl, the amount and the size of silicon nanoparticles were reduced remarkably, which is related with the low temperature deposition of silicon films of highly crystalline fraction with a very thin amorphous incubation layer. The dark conductivity of the intrinsic film prepared at the flow rate ratio of RHCl=[HCl]/[SiH4]=3.61 was 1.84×10-6 Scm-1 at room temperature. The Hall mobility of the n-type silicon film prepared at RHCl=3.61 was 5.72 cm2 V-1s-1. These electrical properties of silicon films are high enough and could be used in flexible electric devices.

  1. Pulsed Laser Deposition of Er doped tellurite films on large area

    Energy Technology Data Exchange (ETDEWEB)

    Bouazaoui, M [Laboratoire PhLAM, UMR 8523, Groupe Photonique, Universite des Sciences et Technologies de Lille, 59655 Villeneuve d' Ascq Cedex (France); Capoen, B [Laboratoire PhLAM, UMR 8523, Groupe Photonique, Universite des Sciences et Technologies de Lille, 59655 Villeneuve d' Ascq Cedex (France); Caricato, A P [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Chiasera, A [CNR-IFN, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Fazzi, A [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Ferrari, M [CNR-IFN, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Leggieri, G [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Martino, M [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Mattarelli, M [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Montagna, M [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy); Romano, F [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Tunno, T [L3 group, Dipartimento di Fisica, Lecce, Via Arnesano, 73100 Lecce (Italy); Turrel, S [Universite des Sciences et Technologies de Lille, Laboratoire de Spectrochimie Infrarouge et Raman, LASIR - UMR 8516 du CNRS - Bat C5 - 59655 - Villeneuve d' Ascq cedex (France); Vishnubhatla, K [Physics Department, CSMFO group, via Sommarive 14, 38100 Povo-Trento (Italy)

    2007-04-15

    Thin films of Er{sup 3+}-doped tungsten tellurite glass have been prepared by the pulsed laser deposition technique using an ArF excimer laser. The depositions were performed at different O{sub 2} pressure (5, 10 Pa) and at different substrate temperatures (RT, 100deg. C and 200deg. C). The composition and the optical properties of the deposited films, such as transmission, dispersion curves of refraction index and extinction coefficient, and film thickness were studied for the different deposition parameters. Transparent films at the highest substrate temperature were obtained only for a higher oxygen pressure with respect to the RT conditions.

  2. Harmonic generation in ZnO nanocrystalline laser deposited thin films

    Science.gov (United States)

    Narayanan, V.; Thareja, R. K.

    2006-04-01

    ZnO plasma produced by third harmonic 355 nm of Nd:YAG laser at various ambient pressures of oxygen was used for depositing quality nanocrystalline ZnO thin films. Time and space resolved optical emission spectroscopy is used to correlate the plasma properties with that of deposited thin films. The deposited films showed particle size of 8 and 84 nm at ambient oxygen pressure of 100 and 900 mTorr, respectively. Third harmonic generation observed in ZnO thin films deposited under 100 mTorr of ambient oxygen is reported.

  3. Thin-film preparation by back-surface irradiation pulsed laser deposition using metal powder targets

    Science.gov (United States)

    Kawasaki, Hiroharu; Ohshima, Tamiko; Yagyu, Yoshihito; Ihara, Takeshi; Yamauchi, Makiko; Suda, Yoshiaki

    2017-01-01

    Several kinds of functional thin films were deposited using a new thin-film preparation method named the back-surface irradiation pulsed laser deposition (BIPLD) method. In this BIPLD method, powder targets were used as the film source placed on a transparent target holder, and then a visible-wavelength pulsed laser was irradiated from the holder side to the substrate. Using this new method, titanium oxide and boron nitride thin films were deposited on the silicon substrate. Surface scanning electron microscopy (SEM) images suggest that all of the thin films were deposited on the substrate with some large droplets irrespective of the kind of target used. The deposition rate of the films prepared by using this method was calculated from film thickness and deposition time to be much lower than that of the films prepared by conventional PLD. X-ray diffraction (XRD) measurement results suggest that rutile and anatase TiO2 crystal peaks were formed for the films prepared using the TiO2 rutile powder target. Crystal peaks of hexagonal boron nitride were observed for the films prepared using the boron nitride powder target. The crystallinity of the prepared films was changed by annealing after deposition.

  4. Photoconductivity and photo-detecting properties of vacuum deposited ZnSe thin films

    Science.gov (United States)

    Gowrish Rao, K.; Bangera, Kasturi V.; Shivakumar, G. K.

    2011-11-01

    The paper reports the detailed analysis of photoconductivity and photo-detecting properties of vacuum deposited zinc selenide (ZnSe) thin films. The vacuum deposited ZnSe films were found to have high absorption coefficient and showed peak photo-response at 460 nm. The photocurrent and photo-response time of the films were measured as a function of substrate temperature and annealing conditions. Considerable increase in photocurrent and much faster photo-response was observed in films deposited at high substrate temperatures. Annealing at moderate temperatures also improved the photoconductivity and response time of the films.

  5. Development of vapor deposited thin films for bio-microsystems

    Science.gov (United States)

    Popat, Ketul Chandrakant

    Increasing demands for more biocompatible and sophisticated bio-microsystems in recent years has led to the development of a new technology called BioMEMS (biological micro-electro-mechanical systems). The foundation of this technology is the same as that of the traditional field of IC (integrated circuits), but an emphasis on developing new diagnostic and therapeutic modalities. Micro- and nano-fabrication techniques are currently being used to develop implants that can record, sense, stimulate and deliver to biological systems. Micromachined substrates can provide unique advantages over traditional implantable devices in terms of their ability to control surface micro-architecture, topography and feature size in micron and nano sizes. However, as BioMEMS technology is rapidly being developed, the practical use of these bio-microsystems is limited due to the inability to effectively interface with the biological system in non-immunogenic and stable manner. This is one of the most important considerations, and hence it is useful to focus on the fundamental scientific issues relating to material science, surface chemistry and immunology of silicon based bio-microsystems. This results in development of biomolecular interfaces that are compatible with both microfabrication processing and biological systems. The overall thrust of this research is to develop, characterize and integrate vapor deposited thin films with bio-microsystems in a manner that it is both reproducible and fully integrated with existing technologies. The main strategy is to use silane coatings precursor coatings on which poly (ethylene glycol) (PEG) will be coated in vapor phase. Silane has been coated user vapor phase, but its chemical and biological characterization and stability of the films under physiological conditions has not been investigated for biological applications. PEG has been coated in solution phase on silicon surface. However, it has not been coated under vapor phase. Here we are

  6. Properties of RF sputtered cadmium telluride (CdTe) thin films: Influence of deposition pressure

    Science.gov (United States)

    Kulkarni, R. R.; Pawbake, A. S.; Waykar, R. G.; Rondiya, S. R.; Jadhavar, A. A.; Pandharkar, S. M.; Karpe, S. D.; Diwate, K. D.; Jadkar, S. R.

    2016-04-01

    Influence of deposition pressure on structural, morphology, electrical and optical properties of CdTe thin films deposited at low substrate temperature (100°C) by RF magnetron sputtering was investigated. The formation of CdTe was confirmed by low angle XRD and Raman spectroscopy. The low angle XRD analysis revealed that the CdTe films have zinc blende (cubic) structure with crystallites having preferred orientation in (111) direction. Raman spectra show the longitudinal optical (LO) phonon mode peak ˜ 165.4 cm-1 suggesting high quality CdTe film were obtained over the entire range of deposition pressure studied. Scanning electron microscopy analysis showed that films are smooth, homogenous, and crack-free with no evidence of voids. The EDAX data revealed that CdTe films deposited at low deposition pressure are high-quality stoichiometric. However, for all deposition pressures, films are rich in Cd relative to Te. The UV-Visible spectroscopy analysis show the blue shift in absorption edge with increasing the deposition pressure while the band gap show decreasing trend. The highest electrical conductivity was obtained for the film deposited at deposition pressure 1 Pa which indicates that the optimized deposition pressure for our sputtering unit is 1 Pa. Based on the experimental results, these CdTe films can be useful for the application in the flexible solar cells and other opto-electronic devices.

  7. Doped Titanium Dioxide Films Prepared by Pulsed Laser Deposition Method

    Directory of Open Access Journals (Sweden)

    Juguang Hu

    2012-01-01

    Full Text Available TiO2 was intensively researched especially for photocatalystic applications. The nitrogen-doped TiO2 films prepared by pulsed laser deposition (PLD method were reviewed, and some recent new experimental results were also presented in this paper. A new optical transmission method for evaluating the photocatalystic activity was presented. The main results are (1 PLD method is versatile for preparing oxide material or complex component films with excellent controllability and high reproducibility. (2 Anatase nitrogen-doped TiO2 films were prepared at room temperature, 200°C, and 400°C by PLD method using novel ceramic target of mixture of TiN and TiO2. UV/Vis spectra, AFM, Raman spectra, and photocatalystic activity for decomposition of methyl orange (MO tests showed that visible light response was improved at higher temperature. (3 The automatic, continuous optical transmission autorecorder method is suitable for detecting the photodecomposition dynamic process of organic compound.

  8. Resistivity, carrier concentration, and carrier mobility of electrochemically deposited CdTe films

    OpenAIRE

    Takahashi, Makoto; Uosaki, Kohei; Kita, Hideaki; Yamaguchi, Shoji

    1986-01-01

    The electrical type, resistivity, and donor or acceptor concentration of CdTe films deposited electrochemically at various potentials were measured. The carrier mobilities of the films were determined from these results. The deposition potential dependence of the mobility was small and the deposition potential dependence of the resistivity was mainly controlled by the deposition potential dependence of the donor or acceptor concentration. The carrier mobilities were very small compared with t...

  9. Synthesis and Microstructural Characterization of SnO2:F Thin Films Deposited by AACVD

    OpenAIRE

    Chavarría-Castillo,Karen Alejandra; Amézaga-Madrid,Patricia; Esquivel-Pereyra,Oswaldo; Antúnez-Flores, Wilber; Pizá Ruiz, Pedro; Miki-Yoshida,Mario

    2016-01-01

    In this work, we report the synthesis and microstructural characterization of Tin oxide thin films doped with fluorine for applications such as transparent conductive oxides. Tin oxide doped with fluorine thin films were deposited by aerosol assisted chemical vapor deposition technique onto a borosilicate glass substrate, using a precursor solution of stannic chloride in ethanol and ammonium fluoride as the dopant. Deposition temperature was varied between 623-773 K. Also, other deposition pa...

  10. Optical properties and residual stress of YbF3 thin films deposited at different temperatures.

    Science.gov (United States)

    Wang, Ying; Zhang, Yue-guang; Chen, Wei-lan; Shen, Wei-dong; Liu, Xu; Gu, Pei-fu

    2008-05-01

    The influence of deposition temperature on the optical properties, microstructure, and residual stress of YbF(3) films, deposited by electron-beam evaporation, has been investigated. The increased refractive indices and surface roughness of YbF(3) films indicate that the film density and columnar structure size increase with deposition temperature. At the same time, higher packing density reduces absorption of moisture. The residual stress is related to deposition temperature and to substrate. For the samples deposited on BK7, the residual stress mainly comes from intrinsic stress, however, for those on fused silica, thermal stress is the dominant factor of total residual stress.

  11. Effects of temperature and deposition time on the RF- sputtered CdTe films preparation

    OpenAIRE

    E. Camacho-Espinosa; Rosendo, E.; T. Díaz; A. I. Oliva; V. Rejon; Peña, J. L.

    2014-01-01

    In this work, CdTe thin films were deposited by rf-sputtering at different substrate temperatures (room temperature (RT), 100, 150, 200, and 250 °C) and deposition times (30, 60, and 90 min). The applied power and vacuum pressure were maintained fixed for all depositions. A mean value of 18 .5 nm/s on the deposition rate was maintained for films deposition. The surface morphology, rms-roughness, and grain size of the sputtered-films were obtained from atomic force microscopy and scanning elec...

  12. Tribological characteristics of gold films deposited on metals by ion plating and vapor deposition

    Science.gov (United States)

    Miyoshi, K.; Spalvins, T.; Buckley, D. H.

    1986-01-01

    The graded interface between an ion-plated film and a substrate is discussed as well as the friction and wear properties of ion-plated gold. X-ray photoelectron spectroscopy (XPS) depth profiling and microhardness depth profiling were used to investigate the interface. The friction and wear properties of ion-plated and vapor-deposited gold films were studied both in an ultra high vacuum system to maximize adhesion and in oil to minimize adhesion. The results indicate that the solubility of gold on the substrate material controls the depth of the graded interface. Thermal diffusion and chemical diffusion mechanisms are thought to be involved in the formation of the gold-nickel interface. In iron-gold graded interfaces the gold was primarily dispersed in the iron and thus formed a physically bonded interface. The hardness of the gold film was influenced by its depth and was also related to the composition gradient between the gold and the substrate. The graded nickel-gold interface exhibited the highest hardness because of an alloy hardening effect. The effects of film thickness on adhesion and friction were established.

  13. Electrical and magnetic properties of ZnNiO thin films deposited by pulse laser deposition

    Institute of Scientific and Technical Information of China (English)

    Jie JIANG; Xue-tao WANG; Li-ping ZHU; Li-qiang ZHANG; Zhi-guo YANG; Zhi-zhen YE

    2011-01-01

    ZnNiO thin films with different contents of Ni (0-10 at.%) were fabricated on quartz and Si (100) substrates bY pulsed laser deposition (PLD).We measured the samples by X-ray diffraction (XRD),field-emission scanning electron microscope (FE-SEM),X-ray photoelectron spectroscopy (XPS),ultraviolet-visible spectrometer (UV-VIS),and Hall testing.When the Ni contents were below 3 at.%,partial Zn2+ ions were replaced by the Ni2+ ions without forming any other phases,which enhanced the conductivity of the film.When the Ni contents were above 3 at.%,Ni ions were at the interstitial sites,and Ni-related clusters and defects were able to emerge in the films,resulting in a worsening of electrical and optical properties.A ferromagnetic hysteresis with a coercive force of approximately 30 Oe was observed in the ZnNiO film with a Ni content of 3 at.% at room temperature.

  14. Comparison of the properties of Pb thin films deposited on Nb substrate using thermal evaporation and pulsed laser deposition techniques

    Science.gov (United States)

    Perrone, A.; Gontad, F.; Lorusso, A.; Di Giulio, M.; Broitman, E.; Ferrario, M.

    2013-11-01

    Pb thin films were prepared at room temperature and in high vacuum by thermal evaporation and pulsed laser deposition techniques. Films deposited by both the techniques were investigated by scanning electron microscopy to determine their surface topology. The structure of the films was studied by X-ray diffraction in θ-2θ geometry. The photoelectron performances in terms of quantum efficiency were deduced by a high vacuum photodiode cell before and after laser cleaning procedures. Relatively high quantum efficiency (>10-5) was obtained for all the deposited films, comparable to that of corresponding bulk. Finally, film to substrate adhesion was also evaluated using the Daimler-Benz Rockwell-C adhesion test method. Weak and strong points of these two competitive techniques are illustrated and discussed.

  15. Microstructural and Electrical Characterization of Barium Strontium Titanate-Based Solid Solution Thin Films Deposited on Ceramic Substrates by Pulsed Laser Deposition

    Science.gov (United States)

    2003-04-03

    Strontium Titanate-Based Solid Solution Thin Films Deposited on Ceramic Substrates by Pulsed Laser Deposition DISTRIBUTION: Approved for public...Society H2.4 Microstructural and Electrical Characterization of Barium Strontium Titanate- based Solid Solution Thin Films Deposited on Ceramic...investigated and report the microstructural and electrical characterization of selected barium strontium titanate-based solid solution thin films

  16. Photocatalytic Property of TiO2 Films Deposited by Pulsed DC Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    Wenjie ZHANG; Shenglong ZHU; Ying LI; Fuhui WANG

    2004-01-01

    TiO2 thin films were prepared by DC magnetron sputtering with the oxygen flow rate higher than the threshold. The film deposited for 5 h was of anatase phase with a preferred orientation along the direction, but the films deposited for 2 and 3 h were amorphous. The transmittance and photocatalytic activity of the TiO2 films increased constantly with increasing film thickness. When the annealing temperature was lower than 700℃, only anatase grew in the TiO2 film. TiO2 phase changed from anatase to rutile when the annealing temperature was above 800℃. The photocatalytic activity decreased with increasing annealing temperature.

  17. Plasma deposited diamond-like carbon films for large neutralarrays

    Energy Technology Data Exchange (ETDEWEB)

    Brown, I.G.; Blakely, E.A.; Bjornstad, K.A.; Galvin, J.E.; Monteiro, O.R.; Sangyuenyongpipat, S.

    2004-07-15

    To understand how large systems of neurons communicate, we need to develop methods for growing patterned networks of large numbers of neurons. We have found that diamond-like carbon thin films formed by energetic deposition from a filtered vacuum arc carbon plasma can serve as ''neuron friendly'' substrates for the growth of large neural arrays. Lithographic masks can be used to form patterns of diamond-like carbon, and regions of selective neuronal attachment can form patterned neural arrays. In the work described here, we used glass microscope slides as substrates on which diamond-like carbon was deposited. PC-12 rat neurons were then cultured on the treated substrates and cell growth monitored. Neuron growth showed excellent contrast, with prolific growth on the treated surfaces and very low growth on the untreated surfaces. Here we describe the vacuum arc plasma deposition technique employed, and summarize results demonstrating that the approach can be used to form large patterns of neurons.

  18. Characterization of polydopamine thin films deposited at short times by autoxidation of dopamine.

    Science.gov (United States)

    Zangmeister, Rebecca A; Morris, Todd A; Tarlov, Michael J

    2013-07-09

    Current interest in melanin films derived from the autoxidation of dopamine stems from their use as a universal adhesion layer. Here we report chemical and physical characterization of polydopamine films deposited on gold surfaces from stirred basic solutions at times ranging from 2 to 60 min, with a focus on times ≤10 min. Data from Fourier transform infrared (FTIR), X-ray photoelectron spectroscopy (XPS), and electrochemical methods suggest the presence of starting (dopamine) and intermediate (C=N-containing tautomers of quinone and indole) species in the polydopamine films at all deposition times. A uniform overlayer analysis of the XPS data indicates that film thickness increased linearly at short deposition times of ≤10 min. At deposition times ≥10 min, the films appeared largely continuous with surface roughness ≈ ≤ 2 nm, as determined by atomic force microscopy (AFM). Pinhole-free films, as determined by anionic redox probe measurements, required deposition times of 60 min or greater.

  19. Chemical Bath Deposition of Nickel Sulphide (Ni4S3 Thin Films

    Directory of Open Access Journals (Sweden)

    Darren TEO

    2010-12-01

    Full Text Available Thin films of nickel sulphide were deposited from aqueous baths on indium tin oxide glass substrate. The chemical bath contained nickel sulphate, sodium thiosulfate and triethanolamine solutions. The aim of the present study was to analyze the different experimental conditions to prepare Ni4S3 thin films using chemical bath deposition technique. The structural, morphological and optical properties of nickel sulphide thin films were obtained by X-ray diffraction, atomic force microscopy and UV-Vis Spectrophotometer will be presented. The properties of the films varied with the variation in the deposition parameters. The films deposited at longer deposition time using lower concentration in more acidic medium showed improved crystallinity, good uniformity and better adhesion to the substrate. Films showed band gap of 0.35 eV and exhibited p-type semiconductor behaviour.

  20. Ion-sputtering deposition of Ca-P-O films for microscopic imaging of osteoblast cells

    Energy Technology Data Exchange (ETDEWEB)

    Ananda Sagari, A.R. [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland)]. E-mail: ananda.sagari@phys.jyu.fi; Lautaret, Claire [ENSICAEN, 6 Boulevard Marechal Juin, F-14050 CAEN Cedex 04 (France); Gorelick, Sergey [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Laitinen, Mikko [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Rahkila, Paavo [Department of Health Sciences, P.O. Box 35 (L), FIN-40014 University of Jyvaeskylae (Finland); Putkonen, Matti [Beneq Oy, Ensimmaeinen savu, FI-01510 Vantaa (Finland); Arstila, Kai [Instituut voor Kern- en Stralingsfysica, K.U.Leuven, Celestijnenlaan 200D, B-3001 Leuven (Belgium); Sajavaara, Timo [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Cheng, Sulin [Department of Health Sciences, P.O. Box 35 (L), FIN-40014 University of Jyvaeskylae (Finland); Whitlow, Harry J. [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland)

    2007-08-15

    An ion-beam sputtering technique was used to produce Ca-P-O films on borosilicate glass at room temperature from hydroxyapatite targets using nitrogen, argon and krypton beams at different acceleration voltages. The sputtering target was pressed from high purity hydroxyapatite powder or mixture of high purity hydroxyapatite powder and red phosphorus in order to optimise the film composition. The film composition, determined using time-of-flight elastic recoil detection analysis (TOF-ERDA), was found to be strongly dependent on the ion energy used for deposition. By extra doping of the target with P the correct Ca/P atomic ratio in the deposited films was reached. The films deposited on Si were amorphous even after annealing at 800 deg, C. The biocompatibility of the films was investigated using osteoblast-like cells. The film deposited under optimal conditions exhibited dendritic growth, indicative of more realistic chemical signalling than for other substratum e.g. polystyrene or plain glass.

  1. Optimised In2S3 Thin Films Deposited by Spray Pyrolysis

    Directory of Open Access Journals (Sweden)

    Hristina Spasevska

    2012-01-01

    Full Text Available Indium sulphide has been extensively investigated as a component for different kind of photovoltaic devices (organic-inorganic hybrid devices, all inorganic, dye sensitized cells. In this paper, we have optimised the growth conditions of indium sulphide thin films by means of a low cost, versatile deposition technique, like spray pyrolysis. The quality of the deposited films has been characterised by micro-Raman, vis-UV spectroscopy, and atomic force microscopy. Substrate deposition temperature and different postdeposition annealing conditions have been investigated in order to obtain information about the quality of the obtained compound (which crystalline or amorphous phases are present and the morphology of the deposited films. We have shown that the deposition temperature influences strongly the amount of amorphous phase and the roughness of the indium sulphide films. Optimised postdeposition annealing treatments can strongly improve the final amount of the beta phase almost independently from the percentage of the amorphous phase present in the as deposited films.

  2. Investigation of Tin (Sn) Film Using an Aerosol Jet Additive Manufacturing Deposition Process

    Science.gov (United States)

    Fortier, Aleksandra; Liu, Yue; Ghamarian, Iman; Collins, Peter C.; Chason, Eric

    2017-08-01

    The quality of a Sn film deposited by the aerosol process is compared against the quality of Sn films deposited with traditional electroplating. Using the aerosol additive deposition technique, a Sn film was deposited on a brass substrate and exposed to room (25°C) temperature environments for 30 days, followed by a laser photosintering process. The film characteristics and content, formation of intermetallic compounds, residual stress distribution, grain texture, and the tendency of the film to grow Sn whiskers were analyzed. The preliminary results show a successful deposition of Sn film with an aerosol jet process and tensile residual stresses, whereas it was compressive in nature for electroplated Sn film. X-ray diffraction results also show the absence of intermetallic compound (IMC) formation in the aerosol jet-deposited film, while electroplated Sn film has a significant presence of IMC. The aerosol jet-deposited Sn film has the potential to resist nucleation of Sn whiskers under the operating conditions used in this study.

  3. Influence of process parameters on the preparation of pharmaceutical films by electrostatic powder deposition.

    Science.gov (United States)

    Prasad, Leena Kumari; LaFountaine, Justin S; Keen, Justin M; Williams, Robert O; McGinity, James W

    2016-12-30

    Electrostatic powder deposition (ESPD) has been developed as a solvent-free method to prepare pharmaceutical films. The aim of this work was to investigate the influence of process parameters during (1) electrostatic powder deposition, (2) curing, and (3) removal of the film from the substrate on the properties of the film. Polyethylene oxide (PEO) was used as the model polymer and stainless steel 316 as the substrate. Deposition efficiency (i.e. deposited weight) was measured with varying charging voltage, gun tip to substrate distance, and environmental humidity. Scanning electron microscopy was utilized to assess film formation, and adhesive and mechanical strength of films were measured with varying cure temperature and time. Adhesive strength was measured for films prepared on substrates of varying surface roughness. When deposition was performed at low humidity conditions, 25%RH, process parameters did not significantly affect deposition behavior. At 40%RH, increasing deposition efficiency with decreasing gun tip to substrate distance and increasing voltage (up to 60kV) was observed. Complete film formation was seen by 30min at 80°C, compared to lower curing temperatures and times. All films were readily removed from the substrates. The results show the ESPD process can be modified to produce films with good mechanical properties (e.g. tensile strength>0.06MPa), suggesting it is a promising dry powder process for preparing pharmaceutical films.

  4. An Investigation of the Relationship between Resistance and Thickness of Deposited Nickel Thin Film Resistors

    Directory of Open Access Journals (Sweden)

    Ericam R.R. Mucunguzi-Rugwebe

    2013-09-01

    Full Text Available The main purpose of this study is finding the relationship between resistance and thickness of deposited Nickel Thin Film Resistors. It was found that the Sheet Resistance, Rs, is inversely proportional to the thickness of the film on the substrate. It was also observed that when the film thickness is greater than 50 nm, films behave like ordinary resistors. In other words in bulk, films obey Ohm’s law if other physical quantities remain constant.

  5. The Influence of Hydrogen on the Properties of Zinc Sulfide Thin Films Deposited by Magnetron Sputtering

    OpenAIRE

    2014-01-01

    Zinc sulfide thin films have been deposited with hydrogen in Ar and Ar+H2 atmosphere by radio frequency magnetron sputtering. The thickness, structural properties, composition, surface morphology, and optical and electrical properties of the films have been investigated. Effect of hydrogen on the properties of the film was studied. The results showed that hydrogen leads to better crystallinity and larger crystallite size of ZnS polycrystalline films. The band gaps of the films in Ar+H2 are ab...

  6. Structural and Optical Study of Chemical Bath Deposited Nano-Structured CdS Thin Films

    Science.gov (United States)

    Kumar, Suresh; Sharma, Dheeraj; Sharma, Pankaj; Sharma, Vineet; Barman, P. B.; Katyal, S. C.

    2011-12-01

    CdS is commonly used as window layer in polycrystalline solar cells. The paper presents a structural and optical study of CdS nano-structured thin films. High quality CdS thin films are grown on commercial glass by means of chemical bath deposition. It involves an alkaline solution of cadmium salt, a complexant, a chalcogen source and a non-ionic surfactant. The films have been prepared under various process parameters. The chemically deposited films are annealed to estimate its effect on the structural and optical properties of films. These films (as -deposited and annealed) have been characterized by means of XRD, SEM and UV-Visible spectrophotometer. XRD of films show the nano-crystalline nature. The energy gap of films is found to be of direct in nature.

  7. Deposition of plasma polymerized perfluoromethylene-dominated films showing oil-repellency

    Science.gov (United States)

    Chase, J. E.; Boerio, F. J.

    2003-05-01

    Plasma polymerized fluorocarbon films were deposited onto polyethylene (PE) substrates to increase oil-repellency of PE. Depositions were performed using the monomer, 1H,1H,2H-perfluoro-1-dodecene in a parallel-plate, radio frequency (rf) reactor, with variable continuous-wave power ranging from 2 to 160 W. The film deposition rate and morphology were strongly dependent on the applied rf power. Most importantly, the chemical structure of the deposited films was also altered, resulting in changes in contact angles of various liquids and the surface energy. Films deposited at low power were composed mainly of perfluoromethylene (CF2) species (up to 67.2%), as shown by x-ray photoelectron spectroscopy (XPS). With an increase in rf power, CF2 content in the film decreased as further fragmentation of the monomer occurred. For each deposition at varying rf powers, even at powers as low as 2 W, the C=C and C-H bonds in the monomer were dissociated by the plasma and not incorporated into the films, as shown by Fourier transform infrared spectroscopy. Oil-repellency, as shown by increased contact angles of hydrocarbon liquids, was found to increase as the amount of CF2 species increased in the film structure. A low critical surface energy (2.7 mJ/m2) was calculated for the film deposited with only 2 W of rf power. Adhesion of the plasma-polymerized films to the PE was also evaluated and found to be poor for films with a high concentration of CF2 species, where cohesive failure within the film occurred. However, adhesion increased as a function of rf power, where the film structure showed more cross-linking. There was a compromise between producing a film with high oleophobicity (oil-repellency) while maintaining adhesion of the film to PE, as some disruption of the CF2 chains in the films was necessary for cohesion through cross-linking.

  8. Ion beam and dual ion beam sputter deposition of tantalum oxide films

    Science.gov (United States)

    Cevro, Mirza; Carter, George

    1994-11-01

    Ion beam sputter deposition (IBS) and dual ion beam sputter deposition (DIBS) of tantalum oxide films was investigated at room temperature and compared with similar films prepared by e-gun deposition. Optical properties ie refractive index and extinction coefficient of IBS films were determined in the 250 - 1100 nm range by transmission spectrophotometry and at (lambda) equals 632.8 nm by ellipsometry. They were found to be mainly sensitive to the partial pressure of oxygen used as a reactive gas in the deposition process. The maximum value of the refractive index of IBS deposited tantalum oxide films was n equals 2.15 at (lambda) equals 550 nm and the extinction coefficient of order k equals 2 X 10-4. Films deposited by e-gun deposition had refractive index n equals 2.06 at (lambda) equals 550 nm. Films deposited using DIBS ie deposition assisted by low energy Ar and O2 ions (Ea equals 0 - 300 eV) and low current density (Ji equals 0 - 40 (mu) A/cm2) showed no improvement in the optical properties of the films. Preferential sputtering occurred at Ea(Ar) equals 300 eV and Ji equals 20 (mu) A/cm2 and slightly oxygen deficient films were formed. Different bonding states in the tantalum-oxide films were determined by x-ray spectroscopy while composition of the film and contaminants were determined by Rutherford scattering spectroscopy. Tantalum oxide films formed by IBS contained relatively high Ar content (approximately equals 2.5%) originating from the reflected argon neutrals from the sputtering target while assisted deposition slightly increased the Ar content. Stress in the IBS deposited films was measured by the bending technique. IBS deposited films showed compressive stress with a typical value of s equals 3.2 X 109 dyn/cm2. Films deposited by concurrent ion bombardment showed an increase in the stress as a function of applied current density. The maximum was s approximately equals 5.6 X 109 dyn/cm2 for Ea equals 300 eV and Ji equals 35 (mu) A/cm2. All

  9. Ion-beam and dual-ion-beam sputter deposition of tantalum oxide films

    Science.gov (United States)

    Cevro, Mirza; Carter, George

    1995-02-01

    Ion-beam sputter deposition (IBS) and dual-ion-beam sputter deposition (DIBS) of tantalum oxide films was investigated at room temperature and compared with similar films prepared by e-gun deposition. The optical properties, i.e., refractive index and extinction coefficient, of IBS films were determined in the 250- to 1100-nm range by transmission spectrophotometry and at (lambda) equals 632.8 nm by ellipsometry. They were found to be mainly sensitive to the partial pressure of oxygen used as a reactive gas in the deposition process. The maximum value of the refractive index of IBS deposited tantalum oxide films was n equals 2.15 at (lambda) equals 550 nm and the extinction coefficient of order k equals 2 X 10-4. Films deposited by e-gun deposition had refractive index n 2.06 at (lambda) equals 550 nm. Films deposited using DIBS, i.e., deposition assisted by low energy Ar and O2 ions (Ea equals 0 to 300 eV) and low current density (Ji equals 0 to 40 (mu) A/cm2), showed no improvement in the optical properties of the films. Preferential sputtering occurred at Ea(Ar) equals 300 eV and Ji equals 20 (mu) A/cm2 and slightly oxygen deficient films were formed. Different bonding states in the tantalum-oxide films were determined by x-ray spectroscopy, whereas composition of the film and contaminants were determined by Rutherford backscattering spectroscopy (RBS). Tantalum oxide films formed by IBS contained relatively high Ar content (approximately equals 2.5%) originating from the reflected argon neutrals from the sputtering target whereas assisted deposition slightly increased the Ar content. Stress in the IBS-deposited films was measured by the bending technique. IBS-deposited films showed compressive stress with a typical value of s equals 3.2 X 109 dyn/cm2. Films deposited by concurrent ion bombardment showed an increase in the stress as a function of applied current density. The maximum was s approximately equals 5.6 X 109 dyn/cm2 for Ea equals 300 eV and Ji equals

  10. Thickness dependence of electrical properties of PZT films deposited on metal substrates by laser-assisted aerosol deposition.

    Science.gov (United States)

    Baba, S; Tsuda, H; Akedo, J

    2008-05-01

    Dependence of electrical properties-dielectric, ferroelectric, and piezoelectric properties-on film thickness was studied for lead-zirconate titanate (PZT) thick films directly deposited onto stainless-steel (SUS) substrates in actuator devices by using a carbon dioxide (CO(2) ), laser assisted aerosol deposition technique. Optical spectroscopic analysis data and laser irradiation experiments revealed that absorption at a given wavelength by the film increased with increasing film thickness. Dielectric constant epsilon, remanent polarization value P(r), and coercive field strength E(c) of PZT films directly deposited onto a SUS-based piezoelectric actuator substrate annealed by CO(2) laser irradiation at 850 degrees C improved with increasing film thickness, and for films thicker than 25 microm, epsilon 800, P(r) 40 microC/cm(2), and E(c) 45 kV/cm. In contrast, the displacement of the SUS-based actuator with the laser-annealed PZT thick film decreased with increasing film thickness.

  11. Oxygen in sputter-deposited ZnTe thin films

    Energy Technology Data Exchange (ETDEWEB)

    Merita, S.; Kraemer, T.; Polity, A.; Meyer, B.K. [I. Physikalisches Institut, Justus-Liebig-Universitaet Giessen, Heinrich-Buff-Ring 16, 35392 Giessen (Germany); Mogwitz, B.; Franz, B. [Physikalisch-Chemisches Institut, Justus-Liebig-Universitaet Giessen, Heinrich-Buff-Ring 58, 35392 Giessen (Germany)

    2006-03-15

    Bandgap-bowing has been observed in many of the zinc-group-VI compounds, when the anion is substituted with an isovalent element. Recently new results on the ZnO{sub 1-x}S{sub x} and ZnO{sub 1-x}Se{sub x} system have been presented, but so far only one report on ZnO{sub 1-x}Te{sub x} is known. We examine the possibility of substituting tellurium by oxygen in sputter-deposited polycrystalline ZnTe thin-films and the effects on bandgap energy and crystal structure. A first approximation of the bowing curve with a lower limit of the bowing parameter of 2.7 eV is performed. (copyright 2006 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  12. Thermoluminescence characterisation of chemical vapour deposited diamond films

    CERN Document Server

    Mazzocchi, S; Bucciolini, M; Cuttone, G; Pini, S; Sabini, M G; Sciortino, S

    2002-01-01

    The thermoluminescence (TL) characteristics of a set of six chemical vapour deposited diamond films have been studied with regard to their use as off-line dosimeters in radiotherapy. The structural characterisation has been performed by means of Raman spectroscopy. Their TL responses have been tested with radiotherapy beams ( sup 6 sup 0 Co photons, photons and electrons from a linear accelerator (Linac), 26 MeV protons from a TANDEM accelerator) in the dose range 0.1-7 Gy. The dosimetric characterisation has yielded a very good reproducibility, a very low dependence of the TL response on the type of particle and independence of the radiation energy. The TL signal is not influenced by the dose rate and exhibits a very low thermal fading. Moreover, the sensitivity of the diamond samples compares favourably with that of standard TLD100 dosimeters.

  13. Mechanical and piezoresistive properties of thin silicon films deposited by plasma-enhanced chemical vapor deposition and hot-wire chemical vapor deposition at low substrate temperatures

    Science.gov (United States)

    Gaspar, J.; Gualdino, A.; Lemke, B.; Paul, O.; Chu, V.; Conde, J. P.

    2012-07-01

    This paper reports on the mechanical and piezoresistance characterization of hydrogenated amorphous and nanocrystalline silicon thin films deposited by hot-wire chemical vapor deposition (HWCVD) and radio-frequency plasma-enhanced chemical vapor deposition (PECVD) using substrate temperatures between 100 and 250 °C. The microtensile technique is used to determine film properties such as Young's modulus, fracture strength and Weibull parameters, and linear and quadratic piezoresistance coefficients obtained at large applied stresses. The 95%-confidence interval for the elastic constant of the films characterized, 85.9 ± 0.3 GPa, does not depend significantly on the deposition method or on film structure. In contrast, mean fracture strength values range between 256 ± 8 MPa and 600 ± 32 MPa: nanocrystalline layers are slightly stronger than their amorphous counterparts and a pronounced increase in strength is observed for films deposited using HWCVD when compared to those grown by PECVD. Extracted Weibull moduli are below 10. In terms of piezoresistance, n-doped radio-frequency nanocrystalline silicon films deposited at 250 °C present longitudinal piezoresistive coefficients as large as -(2.57 ± 0.03) × 10-10 Pa-1 with marginally nonlinear response. Such values approach those of crystalline silicon and of polysilicon layers deposited at much higher temperatures.

  14. A review of basic phenomena and techniques for sputter-deposition of high temperature superconducting films

    Energy Technology Data Exchange (ETDEWEB)

    Auciello, O. (Microelectronics Center of North Carolina, Research Triangle Park, NC (USA) North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Ameen, M.S.; Kingon, A.I.; Lichtenwalner, D.J. (North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Krauss, A.R. (Argonne National Lab., IL (USA))

    1990-01-01

    The processes involved in plasma and ion beam sputter-deposition of high temperature superconducting thin films are critically reviewed. Recent advances in the development of these techniques are discussed in relation to basic physical phenomena, specific to each technique, which must be understood before high quality films can be produced. Control of film composition is a major issue in sputter-deposition of multicomponent materials. Low temperature processing of films is a common goal for each technique, particularly in relation to integrating high temperature superconducting films with the current microelectronics technology. It has been understood for some time that for Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} deposition, the most intensely studied high-{Tc} compound, incorporation of sufficient oxygen into the film during deposition is necessary to produce as-deposited superconducting films at relatively substrate temperatures. Recent results have shown that with the use of suitable buffer layers, high quality Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} sputtered films can be obtained on Si substrates without the need for post-deposition anneal processing. This review is mainly focussed on issues related to sputter-deposition of Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} thin films, although representative results concerning the bismuth and thallium based compounds are included. 143 refs., 11 figs.

  15. Preparation of CoP films by ultrasonic electroless deposition at low initial temperature

    Institute of Scientific and Technical Information of China (English)

    Yundan Yu; Zhenlun Song; Hongliang Ge; Guoying Wei

    2014-01-01

    Electroless deposition technology has been considered as a kind of common ways to obtain cobalt alloy films. However, in order to get cobalt alloy films, high temperature (353 K) is necessary during the electroless deposition process which will increase costs and energy consumption. Ultrasonic was introduced during electroless plating process to obtain cobalt alloy films at lower initial temperature. It was found that the cobalt thin films could be prepared at lower initial temperature (323 K) with the introduction of ultrasonic. Therefore, different powers of ultrasonic were applied during the electroless deposition process to prepare CoP thin films on copper substrates from an alkaline bath in this investigation. The effects of different powers of ultrasonic on deposition rate, surface morphology, anticorrosion performance and magnetic property of films were studied. It was found that the deposition rate increased gradually with the rise in ultrasonic powers due to cavitation phenomenon. All the CoP films presented the typical spherical nodular structures with the impact of ultrasonic. Smaller and regular shaped structures could be observed when the films were deposited with higher power of ultrasonic which contributed directly to enhancement of anticorrosion performance. Saturation magnetization and coercivity of thin films increased gradually with the rise in ultrasonic powers during the electroless deposition process due to the higher amounts of cobalt.

  16. High rate deposition of microcrystalline silicon films by high-pressure radio frequency plasma enhanced chemical vapor deposition (PECVD)

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    Hydrogenated microcrystalline silicon (μc-Si:H) thin films were prepared by high- pressure radio-frequency (13.56 MHz) plasma enhanced chemical vapor deposition (rf-PECVD) with a screened plasma. The deposition rate and crystallinity varying with the deposition pressure, rf power, hydrogen dilution ratio and electrodes distance were systematically studied. By optimizing the deposition parameters the device quality μc-Si:H films have been achieved with a high deposition rate of 7.8 /s at a high pressure. The Voc of 560 mV and the FF of 0.70 have been achieved for a single-junction μc-Si:H p-i-n solar cell at a deposition rate of 7.8 /s.

  17. Properties of pulsed laser deposited NiO/MWCNT thin films

    CSIR Research Space (South Africa)

    Yalisi, B

    2011-05-01

    Full Text Available Pulsed laser deposition (PLD) is a thin-film deposition technique, which uses short and intensive laser pulses to evaporate target material. The technique has been used in this work to produce selective solar absorber (SSA) thin film composites...

  18. Tribological properties of the two-step thermally deposited chromium films

    NARCIS (Netherlands)

    Lazauskas, A.; Baltrusaitis, J.; Grigaliunas, V.; Baltusnikas, A.; Abakeviciene, B.; Polcar, T.

    2013-01-01

    Chromium thin films were prepared on glass substrate via a two-step thermal deposition and their structural, chemical and tribological properties were determined. The X-ray diffraction pattern of the two-step thermally deposited chromium film showed the presence of well-defined body-centered cubic C

  19. Molecular dynamics simulation about porous thin-film growth in secondary deposition

    Energy Technology Data Exchange (ETDEWEB)

    Chen Huawei [School of Mechanical Engineering and Automation, Beihang University, No. 37 Xuyuan Road, Haidian District, Beijing (China) and Mechanical Materials and Mechatronic Engineering, University of Wollongong, Northfields Avenue, NSW 2522 (Australia)]. E-mail: chen_hua_wei@yahoo.com; Tieu, A. Kiet [Mechanical Materials and Mechatronic Engineering, University of Wollongong, Northfields Avenue, NSW 2522 (Australia); Liu Qiang [School of Mechanical Engineering and Automation, Beihang University, No. 37 Xuyuan Road, Haidian District, Beijing (China); Hagiwara, Ichiro [Department of Mechanical Sciences and Engineering, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo (Japan); Lu Cheng [Mechanical Materials and Mechatronic Engineering, University of Wollongong, Northfields Avenue, NSW 2522 (Australia)

    2007-07-15

    The thin film growth has been confirmed to be assembled by an enormous number of clusters in experiments of CVD. Sequence of clusters' depositions proceeds to form the thin film at short time as gas fluids through surface of substrate. In order to grow condensed thin film using series of cluster deposition, the effect of initial velocity, substrate temperature and density of clusters on property of deposited thin film, especially appearance of nanoscale pores inside thin film must be investigated. In this simulation, three different cluster sizes of 203, 653, 1563 atoms with different velocities (0, 10, 100, 1000 and 3000 m/s) were deposited on a Cu(0 0 1) substrate whose temperatures were set between 300 and 1000 K. Four clusters and one cluster were used in primary deposition and secondary deposition, respectively. We have clarified that adhesion between clusters and substrate is greatly influenced by initial velocity. As a result, the exfoliation pattern of deposited thin film is dependent on initial velocity and different between them. One borderline dividing whole region into porous region and nonporous region are obtained to show the effect of growth conditions on appearance of nanoscale pores inside thin film. Moreover, we have also shown that the likelihood of porous thin film is dependent on the point of impact of a cluster relative to previously deposited clusters.

  20. Vapor-deposited thin films with negative real refractive index in the visible regime.

    Science.gov (United States)

    Jen, Yi-Jun; Lakhtakia, Akhlesh; Yu, Ching-Wei; Lin, Chin-Te

    2009-05-11

    A thin film comprising parallel tilted nanorods was deposited by directing silver vapor obliquely towards a plane substrate. The reflection and transmission coefficients of the thin film were measured at three wavelengths in the visible regime for normal-illumination conditions, using ellipsometry and walk-off interferometry. The thin film was found to display a negative real refractive index. Since vapor deposition is a well-established industrial technique to deposit thin films, this finding is promising for large-scale production of negatively refracting metamaterials.

  1. Deposition and characterization of ITO films produced by laser ablation at 355 nm

    DEFF Research Database (Denmark)

    Holmelund, E.; Thestrup Nielsen, Birgitte; Schou, Jørgen;

    2002-01-01

    Indium tin oxide (ITO) films have been deposited by pulsed laser deposition (PLD) at 355 nm. Even though the absorption of laser light at the wavelength 355 nm is much smaller than that of the standard excimer lasers for PLD at 248 nm and 193 nm, high-quality films can be produced. At high fluenc...... light, about 0.9, is also comparable to values for films deposited by excimer lasers. The crystalline structure of films produced at 355 nm is similar to that of samples produced by these lasers....

  2. Macroparticles Reduction Using Filter Free Cathodic Vacuum Arc Deposition Method in ZnO Thin Films.

    Science.gov (United States)

    Yuvakkumar, R; Peranantham, P; Nathanael, A Joseph; Nataraj, D; Mangalaraj, D; Hong, Sun Ig

    2015-03-01

    We report a new method to reduce macroparticles in ZnO thin films using filter free cathodic vacuum arc deposition without using any cooling arrangements operated at low arc current. The detailed mechanism has been proposed to reduce macroparticles during thin film deposition. The successful reduction of macroparticles was confirmed employing FESEM-EDX studies. FESEM images of ZnO thin films deposited with cathode spot to substrate distance from 10 to 20 cm revealed that the population of the macroparticles were reduced with the increase of cathode spot to substrate distances at low arc current. The prepared ZnO films were characterised and showed good structural and optical properties.

  3. Atomic Force Microscopy Studies on The Surface Morphologies of Chemical Bath Deposited Cus Thin Films

    Directory of Open Access Journals (Sweden)

    Ho Soonmin

    2016-06-01

    Full Text Available In this work, copper sulphide thin films were deposited onto microscope glass slide by chemical bath deposition technique. The tartaric acid was served as complexing agent to chelate with Cu2+ to obtain complex solution. The influence of pH value on the surface morphologies of the films has been particularly investigated using the atomic force microscopy technique. The atomic force microscopy results indicate that the CuS films deposited at pH 1 were uniform, compact and pinhole free. However, the incomplete surface coverage observed for the films prepared at high pH (pH 2 and 2.5 values.

  4. Growth and thermoelectric properties of FeSb2 films produced by pulsed laser deposition

    DEFF Research Database (Denmark)

    Sun, Ye; Canulescu, Stela; Sun, Peijie

    2011-01-01

    by ablating specifically prepared compound targets made of Fe and Sb powders in atomic ratio of 1:4. The thermoelectric transport properties of FeSb2 films were investigated. Pulsed laser deposition was demonstrated as a method for production of good-quality FeSb2 films.......Thermoelectric FeSb2 films were produced by pulsed laser deposition on silica substrates in a low-pressure Ar environment. The growth conditions for near phase-pure FeSb2 films were confirmed to be optimized at a substrate temperature of 425°C, an Ar pressure of 2 Pa, and deposition time of 3 h...

  5. Rare earth-doped alumina thin films deposited by liquid source CVD processes

    Energy Technology Data Exchange (ETDEWEB)

    Deschanvres, J.L.; Meffre, W.; Joubert, J.C.; Senateur, J.P. [Ecole Nat. Superieure de Phys. de Grenoble, St. Martin d`Heres (France). Lab. des Materiaux et du Genie Phys.; Robaut, F. [Consortium des Moyens Technologiques Communs, Institut National Polytechnique de Grenoble, BP 75, 38402 St Martin d`Heres (France); Broquin, J.E.; Rimet, R. [Laboratoire d`Electromagnetisme, Microondes et Optoelectronique, CNRS-Ecole Nationale Superieure d`Electronique et Radioelectricite de Grenoble, BP 257, 38016 Grenoble, Cedex (France)

    1998-07-24

    Two types of liquid-source CVD processes are proposed for the growth of rare earth-doped alumina thin films suitable as amplifying media for integrated optic applications. Amorphous, transparent, pure and erbium- or neodymium-doped alumina films were deposited between 573 and 833 K by atmospheric pressure aerosol CVD. The rare earth doping concentration increases by decreasing the deposition temperature. The refractive index of the alumina films increases as a function of the deposition temperature from 1.53 at 573 K to 1.61 at 813 K. Neodymium-doped films were also obtained at low pressure by liquid source injection CVD. (orig.) 7 refs.

  6. Thin films of SiO2 and hydroxyapatite on titanium deposited by spray pyrolysis.

    Science.gov (United States)

    Jokanovic, V; Jokanovic, B; Izvonar, D; Dacic, B

    2008-05-01

    Wet spray pyrolysis of fine, well-dispersed a SiO2 sol was used for the deposition of thin films of silicon dioxide. The sol was obtained by hydrothermal precipitation of silicon acid from a solution at pH = 10. The morphology, roughness, phase composition, chemical homogeneity and the mechanism of the films were investigated by SEM, EDS and IR spectroscopy. The obtained results show a complete covering of the titanium substrate with SiO2 after 3 h of deposition. It was observed that the film thickness increased from 3 to 19 microm, the roughness of the film decreased from 12 to 3 microm, while the morphology of the deposit changed considerably. A hydroxyapatite film was prepared on the so-obtained SiO2 thin film by spray pyrolysis deposition and its morphology and phase composition were investigated.

  7. Theoretical and experimental characterization of TiO{sub 2} thin films deposited at oblique angles

    Energy Technology Data Exchange (ETDEWEB)

    Alvarez, R; Gonzalez-GarcIa, L; Romero-Gomez, P; Rico, V; Cotrino, J; Gonzalez-Elipe, A R; Palmero, A, E-mail: rafael.alvarez@icmse.csic.es [Instituto de Ciencia de Materiales de Sevilla (CSIC-Universidad de Sevilla). Av. Americo Vespucio 49, 41092 Sevilla (Spain)

    2011-09-28

    The microstructural features of amorphous TiO{sub 2} thin films grown by the electron beam physical vapour deposition technique at oblique angles have been experimentally and theoretically studied. The microstructural features of the deposited films were characterized by considering both the column tilt angle and the increase in the column thickness with height. A Monte Carlo model of film growth has been developed that takes into account surface shadowing, short-range interaction between the deposition species and the film surface, as well as the angular broadening of the deposition flux when arriving at the substrate. The good match between simulations and experimental results indicates the importance of these factors in the growth and microstructural development of thin films deposited at oblique angles.

  8. Deposition of silicon films in presence of nitrogen plasma—A feasibility study

    Indian Academy of Sciences (India)

    Sheetal J Patil; Dhananjay S Bodas; G J Phatak; S A Gangal

    2002-10-01

    A design, development and validation work of plasma based ‘activated reactive evaporation (ARE) system’ is implemented for the deposition of the silicon films in presence of nitrogen plasma on substrate maintained at room temperature. This plasma based deposition system involves evaporation of pure silicon by e-beam gun in presence of nitrogen plasma, excited by inductively coupled RF source (13.56 MHz). The activated silicon reacts with the ionized nitrogen and the films get deposited on silicon substrate. Different physical and process related parameters are changed. The grown films are characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM) and ellipsometry. The results indicate that the film contains silicon nitride and a phase of silicon oxy nitride deposited even at room temperature. This shows the feasibility of using the ARE technique for the deposition of silicon films in nitrogen plasma.

  9. Field emissions of graphene films deposited on different substrates by CVD system

    Institute of Scientific and Technical Information of China (English)

    Wang Xiao-Ping; Liu Xiao-Fei; Liu Xin-Xin; Wang Li-Jun; Yang Can; Jing Long-Wei; Li Song-Kun; Pan Xiu-Fang

    2012-01-01

    Graphene films are deposited on copper (Cu) and aluminum (A1) substrates,respectively,by using a microwave plasma chemical vapour deposition technique.Furthermore,these graphene films are characterized by a field emission type scanning electron microscope (FE-SEM),Raman spectra,and field emission (FE) I-V measurements.It is found that the surface morphologies of the films deposited on Cu and Al substrates are different:the field emission property of graphene film deposited on the Cu substrate is better than that on the Al substrate,and the lowest turn-on field of 2.4 V/μm is obtained for graphene film deposited on the Cu substrate.The macroscopic areas of the graphene samples are all above 400 mm2.

  10. Structural and optical properties of manganese oxide thin films deposited by pulsed laser deposition at different substrate temperatures

    Science.gov (United States)

    Jamil, H.; Khaleeq-ur-Rahman, M.; Dildar, I. M.; Shaukat, Saima

    2017-09-01

    We report the use of pulsed laser deposition (PLD) to grow manganese oxide thin films at a fixed low oxygen pressure at different temperatures on silicon (1 0 0) substrates. Structural properties of the thin films were examined using x-ray diffraction and Fourier transform infrared spectroscopy. Surface morphology and topography of the films was determined using atomic force microscopy and optical microscopy, while optical properties of the thin films were studied using spectroscopic ellipsometry. It was found that PLD is a convenient technique to deposit different phases of manganese oxide by tuning the deposition temperature. All measured physical properties such as morphology, topography, crystallite size, and optical band gap were clearly dependent on the substrate temperature chosen.

  11. Formation of aluminum films on silicon by ion beam deposition: A comparison with ionized cluster beam deposition

    Energy Technology Data Exchange (ETDEWEB)

    Zuhr, R.A.; Haynes, T.E.; Galloway, M.D. (Oak Ridge National Lab., TN (USA)); Tanaka, S.; Yamada, A.; Yamada, I. (Kyoto Univ. (Japan). Ion Beam Engineering Lab.)

    1990-01-01

    The direct ion beam deposition (IBD) technique has been used to study the formation of oriented aluminum films on single crystal silicon substrates. In the IBD process, thin film growth is accomplished by decelerating a magnetically-analyzed ion beam to low energies (10--200 eV) for direct deposition onto the substrate under UHV conditions. The energy of the incident ions can be selected to provide the desired growth conditions, and the mass analysis ensures good beam purity. The aluminum on silicon system is one which has been studied extensively by ionized cluster beam (ICB) deposition. In this work, we have studied the formation of such films by IBD with emphasis on the effects of ion energy, substrate temperature, and surface cleanliness. Oriented films have been grown on Si(111) at temperatures from 40{degree} to 300{degree}C and with ion energies from 30 to 120 eV per ion. Completed films were analyzed by ion scattering, x-ray diffraction, scanning electron microscopy, and optical microscopy. Results achieved for thin films grown by IBD are compared with results for similar films grown by ICB deposition. 15 refs., 3 figs.

  12. Cu and Cu(Mn) films deposited layer-by-layer via surface-limited redox replacement and underpotential deposition

    Energy Technology Data Exchange (ETDEWEB)

    Fang, J.S., E-mail: jsfang@nfu.edu.tw [Department of Materials Science and Engineering, National Formosa University, Huwei 63201, Taiwan (China); Sun, S.L. [Department of Materials Science and Engineering, National Formosa University, Huwei 63201, Taiwan (China); Cheng, Y.L. [Department of Electrical Engineering, National Chi-Nan University, Nan-Tou 54561, Taiwan (China); Chen, G.S.; Chin, T.S. [Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan (China)

    2016-02-28

    Graphical abstract: - Abstract: The present paper reports Cu and Cu(Mn) films prepared layer-by-layer using an electrochemical atomic layer deposition (ECALD) method. The structure and properties of the films were investigated to elucidate their suitability as Cu interconnects for microelectronics. Previous studies have used primarily a vacuum-based atomic layer deposition to form a Cu metallized film. Herein, an entirely wet chemical process was used to fabricate a Cu film using the ECALD process by combining underpotential deposition (UPD) and surface-limited redox replacement (SLRR). The experimental results indicated that an inadequate UPD of Pb affected the subsequent SLRR of Cu and lead to the formation of PbSO{sub 4}. A mechanism is proposed to explain the results. Layer-by-layer deposition of Cu(Mn) films was successfully performed by alternating the deposition cycle-ratios of SLRR-Cu and UPD-Mn. The proposed self-limiting growth method offers a layer-by-layer wet chemistry-based deposition capability for fabricating Cu interconnects.

  13. Cu and Cu(Mn) films deposited layer-by-layer via surface-limited redox replacement and underpotential deposition

    Science.gov (United States)

    Fang, J. S.; Sun, S. L.; Cheng, Y. L.; Chen, G. S.; Chin, T. S.

    2016-02-01

    The present paper reports Cu and Cu(Mn) films prepared layer-by-layer using an electrochemical atomic layer deposition (ECALD) method. The structure and properties of the films were investigated to elucidate their suitability as Cu interconnects for microelectronics. Previous studies have used primarily a vacuum-based atomic layer deposition to form a Cu metallized film. Herein, an entirely wet chemical process was used to fabricate a Cu film using the ECALD process by combining underpotential deposition (UPD) and surface-limited redox replacement (SLRR). The experimental results indicated that an inadequate UPD of Pb affected the subsequent SLRR of Cu and lead to the formation of PbSO4. A mechanism is proposed to explain the results. Layer-by-layer deposition of Cu(Mn) films was successfully performed by alternating the deposition cycle-ratios of SLRR-Cu and UPD-Mn. The proposed self-limiting growth method offers a layer-by-layer wet chemistry-based deposition capability for fabricating Cu interconnects.

  14. Rapid synthesis of tantalum oxide dielectric films by microwave microwave-assisted atmospheric chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Ndiege, Nicholas [School of Chemical Sciences, University of Illinois at Urbana-Champaign, 600 South Mathews Avenue, Urbana, IL 61801 (United States)], E-mail: ndiege@uiuc.edu; Subramanian, Vaidyanathan [School of Chemical Sciences, University of Illinois at Urbana-Champaign, 600 South Mathews Avenue, Urbana, IL 61801 (United States)], E-mail: ravisv@unr.edu; Shannon, Mark A. [Mechanical Science and Engineering, University of Illinois at Urbana-Champaign, 1206 West Green street, Urbana, IL 61801 (United States)], E-mail: mshannon@uiuc.edu; Masel, Richard I. [School of Chemical Sciences, University of Illinois at Urbana-Champaign, 600 South Mathews Avenue, Urbana, IL 61801 (United States)], E-mail: r-masel@uiuc.edu

    2008-10-01

    Microwave-assisted chemical vapor deposition has been used to generate high quality, high-k dielectric films on silicon at high deposition rates with film thicknesses varying from 50 nm to 110 {mu}m using inexpensive equipment. Characterization of the post deposition products was performed by scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, Auger electron spectroscopy and Raman spectroscopy. Film growth was determined to occur via rapid formation and accumulation of tantalum oxide clusters from tantalum (v) ethoxide (Ta(OC{sub 2}H{sub 5}){sub 5}) vapor on the deposition surface.

  15. Pulsed laser deposition of carbon nanotube and polystyrene-carbon nanotube composite thin films

    Science.gov (United States)

    Stramel, A. A.; Gupta, M. C.; Lee, H. R.; Yu, J.; Edwards, W. C.

    2010-12-01

    In this work, we report on the fabrication of carbon nanotube thin films via pulsed laser deposition using a pulsed, diode pumped, Tm:Ho:LuLF laser with 2 μm wavelength. The thin films were deposited on silicon substrates using pure carbon nanotube targets and polystyrene-carbon nanotube composite targets. Raman spectra, scanning electron micrographs, and transmission electron micrographs show that carbon nanotubes are present in the deposited thin films, and that the pulsed laser deposition process causes minimal degradation to the quality of the nanotubes when using pure carbon nanotube targets.

  16. Preparation of cuxinygazsen precursor films and powders by electroless deposition

    Science.gov (United States)

    Bhattacharya, Raghu N.; Batchelor, Wendi Kay; Wiesner, Holm; Ramanathan, Kannan; Noufi, Rommel

    1999-01-01

    A method for electroless deposition of Cu.sub.x In.sub.y Ga.sub.z Se.sub.n (x=0-2, y=0-2, z=0-2, n=0-3) precursor films and powders onto a metallic substrate comprising: preparing an aqueous bath solution of compounds selected from the group consisting of: I) a copper compound, a selenium compound, an indium compound and gallium compound; II) a copper compound, a selenium compound and an indium compound; III) a selenium compound, and indium compound and a gallium compound; IV) a selenium compound and a indium compound; and V) a copper compound and selenium compound; each compound being present in sufficient quantity to react with each other to produce Cu.sub.x In.sub.y Ga.sub.z Se.sub.n (x=0-2, y=0-2, z=0-2, n=0-3); adjusting the pH of the aqueous bath solution to an acidic value by the addition of a dilute acid; and initiating an electroless reaction with an oxidizing counterelectrode for a sufficient time to cause a deposit of Cu.sub.x In.sub.y Ga.sub.z Se.sub.n (x=0-2, y=0-2, z=0-2, n=0-3) from the aqueous bath solution onto a metallic substrate.

  17. UHV plasma jet system for deposition of magnetic nitride nanocomposite films with GHz applications

    Energy Technology Data Exchange (ETDEWEB)

    Fendrych, F; Lancok, A [Institute of Physics, Academy of Sciences, Na Slovance 2, CZ-18221 Prague 8 (Czech Republic); Repa, P; Peksa, L; Gronych, T; Vejpravova, J P [Faculty of Math and Physics, Charles University in Prague, V Holesovickach 2, CZ-18000 Prague 8 (Czech Republic); Hedbavny, P [VAKUUM PRAHA, V Holesovickach 2, CZ-18000 Prague 8 (Czech Republic); Schaefer, R [Leibniz Institute IFW Dresden, Helmholtzstr. 20, D-01069 Dresden (Germany); Seemann, K M [Forschungszentrum Karlsruhe, Eggenstein, D-76021 Karlsruhe (Germany)], E-mail: fendrych@fzu.cz

    2008-03-15

    A method of preparation of extremely pure magnetic thin films, especially magnetic nitride nanocomposites for GHz aplications was searched. The plasma-jet method was chosen for its advantages at magnetic materials deposition. Sources of impurities deteriorating the quality of the films were analysed. Based on the assumption that the achievable purity is limited mainly by the conditions at the deposition, an experimental UHV apparatus with the plasma-jet was designed. A number of magnetic thin films from various materials including nitride nanocomposite films was prepared already in this apparatus at UHV conditions. Their magnetic properties are far better than those of the films prepared in a high vacuum apparatus.

  18. Laser annealing of sputter-deposited -SiC and -SiCN films

    Indian Academy of Sciences (India)

    M A Fraga; M Massi; I C Oliveira; F D Origo; W Miyakawa

    2011-12-01

    This work describes the laser annealing of -SiC and -SiCN films deposited on (100) Si and quartz substrates by RF magnetron sputtering. Two samples of -SiCN thin films were produced under different N2/Ar flow ratios. Rutherford backscattering spectroscopy (RBS), Raman analysis and Fourier transform infrared spectrometry (FTIR) techniques were used to investigate the composition and bonding structure of as-deposited and laser annealed SiC and SiCN films.

  19. Deposition and Characterization Of Nanocrystalline Silver Thin Films By Using SILAR Method

    Science.gov (United States)

    Rohom, A. B.; Sartale, S. D.

    2011-07-01

    Nanocrystalline silver thin films were deposited on glass substrate by using Successive Ionic Layer Adsorption and Reduction (SILAR) method. Silver nitrate and hydrazine hydrate (HyH) were used as precursors. The deposited silver thin films were characterized by using X-ray diffraction (XRD), UV-visible-NIR absorption spectroscopy and scanning electron microscopy (SEM) techniques. Effect of concentration of HyH on properties of SILAR grown silver thin films has been extensively studied.

  20. Deposition of YBCO Thin Film by Aerosol Assisted Spray Pyrolysis Method using Nitrate Precursors

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Byeong Joo; Hong, Seok Kwan; Lee, Jong Beom; Lee, Hee Gyoun; Hong, Gye Won [Korea Polytechnic University, Siheung (Korea, Republic of); Kim, Jae Geun [ISEM, University of Wollongong, Wollongong (Korea, Republic of)

    2010-10-15

    Y123 films have been deposited on (100) single-crystal and IBAD substrates by spray pyrolysis method using nitrate precursors. Ultrasonic atomization was adopted to decrease the droplet size, spraying angle and its moving velocity toward substrate for introducing the preheating tube furnace in appropriate location. A small preheating tube furnace was installed between spraying nozzle and substrate for fast drying and enhanced decomposition of precursors. C-axis oriented films were obtained on both LAO and IBAD substrates at deposition temperature of around and working pressures of 10-15 torr. Thick c-axis epitaxial film with the thickness of was obtained on LAO single-crystal by 10 min deposition. But the XRD results of the film deposited on IBAD template at same deposition condition showed that the buffer layers of the IBAD metal substrate was affected by long residence of metal substrate at high temperature for YBCO deposition.

  1. Photoluminescence Response in Carbon Films Deposited by Pulsed Laser Deposition onto GaAs Substrates at Low Vacuum

    Directory of Open Access Journals (Sweden)

    F. Caballero-Briones

    2016-01-01

    Full Text Available Carbon films were deposited onto GaAs substrates by pulsed laser deposition at low vacuum (10–15 mTorr from a graphite target. Films were prepared at different number of pulses (1500 to 6000 with fixed fluence (32 J/cm2, target-to-substrate distance, and pulse frequency using a Q:Switched Nd:YAG laser at 1064 nm operating at a frequency of 10 Hz and producing burst-mode pulses with total duration per shot of 49 ns. Films were characterized by optical microscopy, atomic force microscopy, laser induced breakdown spectroscopy, X-ray diffraction, and photoluminescence spectroscopy. Deposited films were visually smooth and adherent but on the other hand evidence of splashing was observed in all the films. Thickness varied linearly with the number of pulses from 8 to 42 μm with maximum height differences around 700 nm. Hexagonal and orthorhombic carbon was found in all the films and there was no evidence of nitrogen or oxygen incorporation during ablation process. Broad photoluminescence bands were observed and, particularly, emission peaks at 475–480 nm, 540–550 nm, 590 nm, and 625 nm. Bands tend to shift to lower wavelength with film thickness, suggesting that luminescence comes from splashed nanostructures influenced by the semiconducting substrate. This particular substrate effect is vanished as thickness of the films increases.

  2. Sputter deposition of ZnO thin films at high substrate temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Kronenberger, Achim; Eisermann, Sebastian; Laufer, Andreas; Graubner, Swen; Polity, Angelika; Meyer, Bruno K. [I. Physikalisches Institut, Justus-Liebig-Universitaet Giessen (Germany)

    2008-07-01

    For the use of sputter deposited ZnO thin films in semiconductor devices, not only the electrical behaviour but also to maintain high crystal quality of the deposited films is important. Pure ZnO thin films have been prepared on quartz glass and sapphire substrates by radio-frequency (RF) sputtering using a ceramic ZnO target. The substrate-temperature during the deposition could be adjusted from RT up to 735 C. Argon was used as sputter-gas and oxygen as reactive-gas to change the stoichiometry of the deposited thin films. The crystallinity of the deposited films has been analysed by XRD measurements. For optical and electrical characterisation optical transmission and Hall-effect measurements have been performed. To investigate impurities the films have been analysed by EDX and SIMS. The focus was set on the electrical and optical properties of the deposited ZnO thin films and their changing behaviour in the cause of the different deposition parameters such as gas pressures, substrate temperature and rf-power. The aim was to gain control over changing the resistivity in a wide range, while keeping the films transparent in the visible region of the electromagnetic spectra and simultaneous maintain a high crystal quality.

  3. Electrophoretic deposition of composite halloysite nanotube–hydroxyapatite–hyaluronic acid films

    Energy Technology Data Exchange (ETDEWEB)

    Deen, I. [Department of Materials Science and Engineering, McMaster University, 1280 Main Street West, Hamilton, Ontario, Canada L8S 4L7 (Canada); Zhitomirsky, I., E-mail: zhitom@mcmaster.ca [Department of Materials Science and Engineering, McMaster University, 1280 Main Street West, Hamilton, Ontario, Canada L8S 4L7 (Canada)

    2014-02-15

    Highlights: ► Composite halloysite nanotubes–hydroxyapatite–hyaluronic acid films were prepared. ► Electrophoretic deposition method was used for deposition. ► Natural hyaluronic acid was used as a dispersing, charging and film forming agent. ► Film composition and deposition yield can be varied. ► The films can be used for biomedical implants with controlled release of drugs. -- Abstract: Electrophoretic deposition method has been developed for the deposition of biocomposite films containing halloysite nanotubes (HNTs), hydroxyapatite (HA) and hyaluronic acid. The method is based on the use of natural hyaluronate biopolymer as a dispersing and charging agent for HNT and HA and film forming agent for the fabrication of the composite films. The deposition kinetics was studied by the quartz crystal microbalance method. The composite films were studied by X-ray diffraction, thermogravimetric analysis, differential thermal analysis and electron microscopy. The composite films are promising materials for the fabrication of biomedical implants with advanced functional properties.

  4. Optimised In2S3 Thin Films Deposited by Spray Pyrolysis

    OpenAIRE

    Hristina Spasevska; Catherine C. Kitts; Cosimo Ancora; Giampiero Ruani

    2012-01-01

    Indium sulphide has been extensively investigated as a component for different kind of photovoltaic devices (organic-inorganic hybrid devices, all inorganic, dye sensitized cells). In this paper, we have optimised the growth conditions of indium sulphide thin films by means of a low cost, versatile deposition technique, like spray pyrolysis. The quality of the deposited films has been characterised by micro-Raman, vis-UV spectroscopy, and atomic force microscopy. Substrate deposition temperat...

  5. Optimised In2S3 Thin Films Deposited by Spray Pyrolysis

    OpenAIRE

    Hristina Spasevska; Kitts, Catherine C.; Cosimo Ancora; Giampiero Ruani

    2012-01-01

    Indium sulphide has been extensively investigated as a component for different kind of photovoltaic devices (organic-inorganic hybrid devices, all inorganic, dye sensitized cells). In this paper, we have optimised the growth conditions of indium sulphide thin films by means of a low cost, versatile deposition technique, like spray pyrolysis. The quality of the deposited films has been characterised by micro-Raman, vis-UV spectroscopy, and atomic force microscopy. Substrate deposition temperat...

  6. Dynamic Deposition of Nanocopper Film on the β-SiCp Surface by Magnetron Sputtering

    Directory of Open Access Journals (Sweden)

    Hu Ming

    2015-01-01

    Full Text Available The uniform nanocopper film was deposited on the surface of micron β-SiC particle by magnetron sputtering technology successfully. The surface morphology and phase constitution of the β-SiC particle with nanocopper film were analyzed and dynamic deposition behavior was investigated in detail. The concept of dynamic deposition was put forward to interpret formation mechanism of copper nanofilm on the surface of β-SiC particles.

  7. Characterisation of Pb thin films prepared by the nanosecond pulsed laser deposition technique for photocathode application

    Energy Technology Data Exchange (ETDEWEB)

    Lorusso, A., E-mail: antonella.lorusso@le.infn.it [Dipartimento di Matematica e Fisica “E. De Giorgi” and Istituto Nazionale di Fisica Nucleare, Università del Salento, Lecce 73100 (Italy); Gontad, F. [Dipartimento di Matematica e Fisica “E. De Giorgi” and Istituto Nazionale di Fisica Nucleare, Università del Salento, Lecce 73100 (Italy); Broitman, E. [Department of Physics, Chemistry and Biology (IFM), Linköping University, Linköping SE-581 83 (Sweden); Chiadroni, E. [Laboratori Nazionali di Frascati, Istituto Nazionale di Fisica Nucleare, Frascati 00044 (Italy); Perrone, A. [Dipartimento di Matematica e Fisica “E. De Giorgi” and Istituto Nazionale di Fisica Nucleare, Università del Salento, Lecce 73100 (Italy)

    2015-03-31

    Pb thin films were prepared by the nanosecond pulsed laser deposition technique on Si (100) and polycrystalline Nb substrates for photocathode application. As the photoemission performances of a cathode are strongly affected by its surface characteristics, the Pb films were grown at different substrate temperatures with the aim of modifying the morphology and structure of thin films. An evident morphological modification in the deposited films with the formation of spherical grains at higher temperatures has been observed. X-ray diffraction measurements showed that a preferred orientation of Pb (111) normal to the substrate was achieved at 30 °C while the Pb (200) plane became strongly pronounced with the increase in the substrate temperature. Finally, a Pb thin film deposited on Nb substrate at 30 °C and tested as the photocathode showed interesting results for the application of such a device in superconducting radio frequency guns. - Highlights: • Pb thin films obtained by the nanosecond pulsed laser deposition technique at different substrate temperature. • The substrate temperature modifies the morphology and structure of Pb films. • Pb thin film was deposited at room temperature for photocathode application. • The Pb thin film photocathode was tested and the quantum efficiency of the device improved after laser cleaning treatment of the film surface.

  8. Properties of multilayer gallium and aluminum doped ZnO(GZO/AZO)transparent thin films deposited by pulsed laser deposition process

    Institute of Scientific and Technical Information of China (English)

    Jin-Hyum SHIN; Dong-Kyun SHIN; Hee-Young LEE; Jai-Yeoul LEE

    2011-01-01

    Multilayer gallium and aluminum doped ZnO (GZO/AZO) films were fabricated by alternative deposition of Ga-doped zinc oxide(GZO) and Al-doped zinc oxide(AZO) thin film by using pulsed laser deposition(PLD) process. The electrical and optical properties of these GZO/AZO thin films were investigated and compared with those of GZO and AZO thin films. The GZO/AZO GZO/AZO thin films linearly decreases with increasing the Al ratio.

  9. Chemical vapor deposition polymerization the growth and properties of parylene thin films

    CERN Document Server

    Fortin, Jeffrey B

    2004-01-01

    Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

  10. Underpotential deposition-mediated layer-by-layer growth of thin films

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Jia Xu; Adzic, Radoslav R.

    2015-05-19

    A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves the use of underpotential deposition of a first element to mediate the growth of a second material by overpotential deposition. Deposition occurs between a potential positive to the bulk deposition potential for the mediating element where a full monolayer of mediating element forms, and a potential which is less than, or only slightly greater than, the bulk deposition potential of the material to be deposited. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis. This process is especially suitable for the formation of a catalytically active layer on core-shell particles for use in energy conversion devices such as fuel cells.

  11. AFM Study on Reliability of Nanoscale DLC Films Deposited by ECR-MPCVD

    Institute of Scientific and Technical Information of China (English)

    ZHU Shou-xing; ZHU Shi-gen; DING Jian-ning

    2004-01-01

    Nanoindentation, scratch and wear tests based on an atomic force microscope (AFM) were carried out to study the reliability of diamond-like carbon (DLC) films, deposited by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD). The predictors for film reliability were given to investigate the resistance of DLC films to indent, scratch, and wear. Experimental results showed that the films at 64.9nm and 12.07nm exhibited better reliability than thin one at 2.78nm, 4.48nm. In addition, the reliability strength of films above 12.07nm went stable, and the films showed good performance of anti-indentation, anti-scratch and anti-wear. Finally, size effect of nanoscale monolayer film was introduced to explain the reliability of nanoscale DLC films.

  12. n-type In2S3 films deposited by pulsed laser deposition: effect of laser power on the properties of the films

    Science.gov (United States)

    Wu, Chunyan; Mao, Dun; Liu, Zhu; Liang, Qi; Chen, Shirong; Yu, Yongqiang; Wang, Li; Luo, Linbao; Xu, Jun

    2015-05-01

    Pulsed laser deposition (PLD) with different levels of laser power was first used to deposit In2S3 films from homemade, high-purity In2S3 targets. This process was followed by post-annealing in an N2 atmosphere to improve the films’ crystallinity and conductivity. The annealed films were verified to be stoichiometric, body-centered, tetragonal In2S3 with the preferred orientation (103). The bandgap of the films decreased from 2.8 to 2.2 eV with an increase in the laser power, which was believed to be the result of the grain growth caused by the higher laser power. The electrical transport property of the bottom-gate field-effect transistor revealed the n-type conduction of the annealed In2S3 films, and the heterojunction p+-Si/annealed In2S3 film showed remarkable photovoltaic behavior upon light illumination, indicating that PLD-deposited In2S3 films may have great potential as a buffer layer in thin-film solar cells. What’s more, doped In2S3 films can be easily realized due to the fairly stoichiometric transfer of the PLD method.

  13. Apparatus and method for selective area deposition of thin films on electrically biased substrates

    Science.gov (United States)

    Zuhr, Raymond A.; Haynes, Tony E.; Golanski, Andrzej

    1994-01-01

    An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.

  14. Improvement of the Crystallinity of Silicon Films Deposited by Hot-Wire Chemical Vapor Deposition with Negative Substrate Bias

    Science.gov (United States)

    Zhang, Lei; Shen, Honglie; You, Jiayi

    2013-08-01

    We have investigated the effect of negative substrate bias on microcrystalline silicon films deposited on glass and stainless steel by hot-wire chemical vapor deposition (HWCVD) to gain insight into the effect of negative substrate bias on crystallization. Structural characterization of the silicon films was performed by Raman spectroscopy, x-ray diffraction, and scanning electron microscopy. It was found that the crystallinity of the films is obviously improved by applying the substrate bias, especially for films on stainless steel. At hot-wire temperature of 1800°C and negative substrate bias of -800 V, grain size as large as 200 nm was obtained on stainless-steel substrate with crystalline fraction 9% higher than that of films deposited on glass and 15% higher than that of films deposited without substrate bias. It is deduced that the improvement of the crystallinity is mainly related to the accelerated electrons emitted from the hot wires. The differences in this improvement between different substrates are caused by the different electrical potential of the substrates. A solar cell fabricated by HWCVD with -800 V substrate bias is demonstrated, showing an obviously higher conversion efficiency than that without substrate bias.

  15. Surface modification of reverse osmosis desalination membranes by thin-film coatings deposited by initiated chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Ozaydin-Ince, Gozde, E-mail: gozdeince@sabanciuniv.edu [Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139 (United States); Matin, Asif, E-mail: amatin@mit.edu [Department of Mechanical Engineering, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia); Khan, Zafarullah, E-mail: zukhan@mit.edu [Department of Mechanical Engineering, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia); Zaidi, S.M. Javaid, E-mail: zaidismj@kfupm.edu.sa [Department of Mechanical Engineering, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia); Gleason, Karen K., E-mail: kkgleasn@mit.edu [Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139 (United States)

    2013-07-31

    Thin-film polymeric reverse osmosis membranes, due to their high permeation rates and good salt rejection capabilities, are widely used for seawater desalination. However, these membranes are prone to biofouling, which affects their performance and efficiency. In this work, we report a method to modify the membrane surface without damaging the active layer or significantly affecting the performance of the membrane. Amphiphilic copolymer films of hydrophilic hydroxyethylmethacrylate and hydrophobic perfluorodecylacrylate (PFA) were synthesized and deposited on commercial RO membranes using an initiated chemical vapor deposition technique which is a polymer deposition technique that involves free-radical polymerization initiated by gas-phase radicals. Relevant surface characteristics such as hydrophilicity and roughness could be systematically controlled by varying the polymer chemistry. Increasing the hydrophobic PFA content in the films leads to an increase in the surface roughness and hydrophobicity. Furthermore, the surface morphology studies performed using the atomic force microscopy show that as the thickness of the coating increases average surface roughness increases. Using this knowledge, the coating thickness and chemistry were optimized to achieve high permeate flux and to reduce cell attachment. Results of the static bacterial adhesion tests show that the attachment of bacterial cells is significantly reduced on the coated membranes. - Highlights: • Thin films are deposited on reverse osmosis membranes. • Amphiphilic thin films are resistant to protein attachment. • The permeation performance of the membranes is not affected by the coating. • The thin film coatings delayed the biofouling.

  16. Effects of Buffer Salt Concentration on the Dominated Deposition Mechanism and Optical Characteristics of Chemically Deposited Cadmium Sulfide Thin Films

    Science.gov (United States)

    Kakhaki, Z. Makhdoumi; Youzbashi, A.; Sangpour, P.; Kazemzadeh, A.; Naderi, N.; Bazargan, A. M.

    2016-02-01

    Effects of buffer salt concentration on the rate of deposition, dominated deposition mechanism and subsequently the structural, morphological, and optical properties of cadmium sulfide (CdS) thin films deposited by chemical bath deposition (CBD) on glass substrate were investigated. The precursors were chosen to be cadmium chloride (CdCl2) as the cadmium source, thiourea (CS(NH2)2) as the sulfur source, ammonium nitrate (NH4NO3) as the buffer salt and ammonia as the complexing agent and the pH controller. The influence of the NH4NO3 concentration on the structure, morphology, film uniformity, stoichiometry and optical properties of CdS thin films was also studied by X-ray diffractometer (XRD), field emission scanning electron microscope (FE-SEM), energy dispersive X-ray (EDX) spectroscope, uv-visible and photoluminescence (PL) spectroscopes. The XRD studies revealed that all the deposited films exhibited a (002)h/(111)c preferred orientation. The crystallite size was increased from 20nm to 30nm by the increase of concentration of NH4NO3 from 0.5M to 2.5M. The morphology of CdS thin films were agglomerated spherical particles consisted of smaller particles. The surface of thin films deposited at the NH4NO3 concentration of 0.5M was compact and smooth. The increase of the concentration of NH4NO3 decreased the packing density of the films. The optical band gap was in the range of 2.25-2.4eV, which was decreased by the decrement of packing density. The PL spectra showed two peaks centered at 400nm and 500nm which are attributed to violet and band-to-band emissions, respectively.

  17. Fabrication of solid-state thin-film batteries using LiMnPO{sub 4} thin films deposited by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Fujimoto, Daichi [Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577 (Japan); Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China); Kuwata, Naoaki, E-mail: kuwata@tagen.tohoku.ac.jp [Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577 (Japan); Matsuda, Yasutaka; Kawamura, Junichi [Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577 (Japan); Kang, Feiyu [Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China)

    2015-03-31

    Solid-state thin-film batteries using LiMnPO{sub 4} thin films as positive electrodes were fabricated and the electrochemical properties were characterized. The LiMnPO{sub 4} thin films were deposited on Pt coated glass substrates by pulsed laser deposition. In-plane X-ray diffraction revealed that the LiMnPO{sub 4} thin films were well crystallized and may have a texture with a (020) orientation. The deposition conditions were optimized; the substrate temperature was 600 °C and the argon pressure was 100 Pa. The electrochemical measurements indicate that the LiMnPO{sub 4} films show charge and discharge peaks at 4.3 V and 4.1 V, respectively. The electrical conductivity of the LiMnPO{sub 4} film was measured by impedance spectroscopy to be 2 × 10{sup −11} S cm{sup −1} at room temperature. The solid-state thin-film batteries that show excellent cycle stability were fabricated using the LiMnPO{sub 4} thin film. Moreover, the chemical diffusion of the LiMnPO{sub 4} thin film was studied by cyclic voltammetry. The chemical diffusion coefficient of the LiMnPO{sub 4} thin film is estimated to be 3.0 × 10{sup −17} cm{sup 2} s{sup −1}, which is approximately four orders magnitude smaller than the LiFePO{sub 4} thin films, and the capacity of the thin-film battery was gradually increased for 500 cycles. - Highlights: • Olivine-type LiMnPO{sub 4} thin-films were fabricated by pulsed laser deposition. • The electrochemical properties were characterized by using solid-state thin-film batteries. • Chemical diffusion coefficient of LiMnPO{sub 4} thin film was estimated by cyclic voltammetry. • Thin-film batteries, Li/Li{sub 3}PO{sub 4}/LiMnPO{sub 4}, show excellent cycle stability up to 500 cycles.

  18. TiO2 Thin Film UV Detectors Deposited by DC Reactive Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHANG Li-wei; YAO Ning; ZHANG Bing-lin; FAN Zhi-qin; YANG Shi-e; LU Zhan-ling

    2004-01-01

    Crystalline TiO2 thin films were prepared by DC reactive magnetron sputtering on indium-tin oxide(ITO) thin film deposited on quartz substrate, the photoconductive UV detector on TiO2 thin films was based on a sandwich structure of C/ TiO2/ITO. The measurement of the I-V characteristics for these devices shows good ohmic contact. The photoresponse of TiO2 thin films was analyzed at different bias voltage. Voltage.

  19. Three-dimensional Ordered Silica Colloidal Film Self-assembly Deposited on a Vertical Substrate

    Institute of Scientific and Technical Information of China (English)

    刘丽霞; 董鹏; 王晓冬; 程丙英

    2003-01-01

    A method for preparation of particle crystal film constructed trom monodisperse silica colloidal partices in diameter of about 300 nm is reported. The films were prepared from an ethanol suspension by vertical deposition that relies on capillary forces to assemble colloidal crystal particles on a vertical substrate. The 3D ordered films were characterized by transmission spectra and scanning electric microscope (SEM). The effect of evaporation temperature, particle concentration and sintered temperature on the quality of colloidal particle crystal film was investigated.

  20. Chemical spray pyrolysis of β-In2S3 thin films deposited at different temperatures

    OpenAIRE

    SALL, THIERNO; Marí Soucase, Bernabé; Mollar García, Miguel Alfonso; Hartitti, Bouchaib; Fahoume, Mounir

    2015-01-01

    In2S3 thin films were deposited onto indium tin oxide-coated glass substrates by chemical spray pyrolysis while keeping the substrates at different temperatures. The structures of the sprayed In2S3 thin films were characterized by X-ray diffraction (XFD). The quality of the thin films was determined by Raman spectroscopy. Scanning electron microscopy (SEM) and atomic force microscopy were used to explore the surface morphology and topography of the thin films, respectively. The optic...

  1. The influence of methanol addition during the film growth of SnO 2 by atmospheric pressure chemical vapor deposition

    NARCIS (Netherlands)

    Volintiru, I.; Graaf, A. de; Deelen, J. van; Poodt, P.W.G.

    2011-01-01

    Undoped tin oxide (SnO2) thin films have been deposited in a stagnant point flow chemical vapor deposition reactor from a water/tin tetrachloride mixture. By adding methanol during the deposition process the film electrical properties change significantly: ten times more conductive SnO 2 films are o

  2. Electrical conductivity mechanisms in zinc oxide thin films deposited by pulsed laser deposition using different growth environments

    Energy Technology Data Exchange (ETDEWEB)

    Heluani, S.P. [Laboratorio de Fisica del Solido, Departamento de Fisica, Facultad de Ciencias Exactas y Tecnologia, Universidad Nacional de Tucuman (Argentina)]. E-mail: sperez@herrera.unt.edu.ar; Braunstein, G. [Department of Physics, University of Central Florida, Orlando, FL 32816 (United States); Villafuerte, M. [Laboratorio de Fisica del Solido, Departamento de Fisica, Facultad de Ciencias Exactas y Tecnologia, Universidad Nacional de Tucuman (Argentina); Simonelli, G. [Laboratorio de Fisica del Solido, Departamento de Fisica, Facultad de Ciencias Exactas y Tecnologia, Universidad Nacional de Tucuman (Argentina); Duhalde, S. [Laboratorio de Ablacion Laser, Facultad de Ingenieria, Universidad de Buenos Aires (Argentina)

    2006-12-05

    The mechanisms of electrical conduction in zinc oxide thin films, grown by pulsed laser deposition, have been investigated as a function of preparation conditions. The films were deposited on glass and silicon nitride coated silicon, using oxygen rich, oxygen deficient, or nitrogen atmospheres. The substrates were held at 473 K during deposition, and subsequently cooled down to room temperature in oxygen rich atmosphere of 4 Pa, or oxygen deficient atmosphere of 2 x 10{sup -3} Pa. Films deposited and cooled in an oxygen deficient atmosphere exhibited very high donor concentration, originated in intrinsic defects, and an impurity band related mechanism of conduction. Films deposited under relatively high oxygen pressure were highly resistive and showed, upon ultraviolet light irradiation, grain boundary controlled electrical transport. An enhancement of the conductivity was observed when using a nitrogen atmosphere during the deposition, and oxygen atmosphere during cooling. In this case, the dependence of the conductivity with temperature followed Motts' Law of variable range hopping, characteristic of a material with localized states randomly located in space. Since the density of hopping centers appears to be much larger than the density of nitrogen incorporated in this sample, it is suggested that the nitrogen induces defects in the zinc oxide lattice that behave as localized hopping centers, as well as carrier suppliers, giving rise to the observed conductivity.

  3. Structural, morphological, optical and electrical properties of spray deposited lithium doped CdO thin films

    Energy Technology Data Exchange (ETDEWEB)

    Velusamy, P.; Babu, R. Ramesh, E-mail: rampap2k@yahoo.co.in [Crystal Growth and Thin Films Laboratory, Department of Physics, Bharathidasan University, Tiruchirappalli-620 024, Tamil Nadu (India); Ramamurthi, K. [Crystal Growth and Thin Films Laboratory, Department of Physics and Nanotechnology, Faculty of Engineering and Technology, SRM University, Kattankulathur – 603 203, Tamil Nadu (India)

    2016-05-23

    In the present work, CdO and Li doped CdO thin films were deposited on microscopic glass substrates at 300°C by a spray pyrolysis experimental setup. The deposited CdO and Li doped CdO thin films were subjected to XRD, SEM, UV-VIS spectroscopy and Hall measurement analyses. XRD studies revealed the polycrystalline nature of the deposited films and confirmed that the deposited CdO and Li doped CdO thin films belong to cubic crystal system. The Scanning electron microscopy analysis revealed the information on shape of CdO and Li doped CdO films. Electrical study reveals the n-type semiconducting nature of CdO and the optical band gap is varied between 2.38 and 2.44 eV, depending on the Li doping concentrations.

  4. Nanostructured rhodium films for advanced mirrors produced by Pulsed Laser Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Uccello, A., E-mail: andrea.uccello@mail.polimi.it [Dipartimento di Energia, Politecnico di Milano, Milan (Italy); Dellasega, D., E-mail: david.dellasega@polimi.it [Dipartimento di Energia, Politecnico di Milano, Milan (Italy); Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Milan (Italy); Perissinotto, S., E-mail: stefano.perissinotto@iit.it [Center for Nano Science and Technology - Polimi, Istituto Italiano di Tecnologia, Milan (Italy); Lecis, N., E-mail: nora.lecis@polimi.it [Dipartimento di Meccanica, Politecnico di Milano, Milan (Italy); Passoni, M., E-mail: matteo.passoni@polimi.it [Dipartimento di Energia, Politecnico di Milano, Milan (Italy); Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Milan (Italy)

    2013-01-15

    In this paper advantages in the production by Pulsed Laser Deposition (PLD) of nanostructured, nanoengineered rhodium films to be used in tokamak First Mirrors (FMs) are shown. The peculiar PLD capability to tailor film structure at the nanoscale gives the possibility to deposit low roughness Rh films with a wide variety of structures and morphologies. By a proper movimentation of the substrate and using high fluence (10-19 J/cm{sup 2}) infrared laser pulses, it has been possible to deposit planar and homogeneous Rh films effectively suppressing surface defects on areas of the order of 10 cm{sup 2} with a satisfactory specular reflectivity. Multilayer deposition has been exploited to produce coatings with high adhesion and good mechanical properties. Finally, an estimation of the requirements to produce by PLD rhodium films suitable for the requests of ITER is provided.

  5. Structural, morphological, optical and electrical properties of spray deposited lithium doped CdO thin films

    Science.gov (United States)

    Velusamy, P.; Babu, R. Ramesh; Ramamurthi, K.

    2016-05-01

    In the present work, CdO and Li doped CdO thin films were deposited on microscopic glass substrates at 300˚C by a spray pyrolysis experimental setup. The deposited CdO and Li doped CdO thin films were subjected to XRD, SEM, UV-VIS spectroscopy and Hall measurement analyses. XRD studies revealed the polycrystalline nature of the deposited films and confirmed that the deposited CdO and Li doped CdO thin films belong to cubic crystal system. The Scanning electron microscopy analysis revealed the information on shape of CdO and Li doped CdO films. Electrical study reveals the n-type semiconducting nature of CdO and the optical band gap is varied between 2.38 and 2.44 eV, depending on the Li doping concentrations.

  6. Epitaxial growth of magnetic ZnCuO thin films by pulsed laser deposition

    Science.gov (United States)

    Kim, Dong Hun; Kim, Tae Cheol; Lee, Seung Han; Jung, Hyun Kyu; Jeong, Jaeeun; Han, Seung Ho

    2017-02-01

    The crystal structure and magnetic properties of epitaxial ZnO thin films doped with 5 at% Cu on SrTiO3 (001) and (111) substrates were investigated. In the case of films deposited in oxygen, unique crystallographic growth directions on different substrates were observed, while a metallic phase was detected in films grown under vacuum. The Cu-doped ZnO thin films deposited on the SrTiO3 (111) substrates, with hexagonal structures, showed a single epitaxial relationship with the substrates, whereas those deposited on the SrTiO3 (001) substrates showed a double epitaxial growth mode. The epitaxial ZnCuO thin films deposited on the SrTiO3 (111) substrates under high vacuum exhibited a ferromagnetic signal at room temperature.

  7. Induced recrystallization of CdTe thin films deposited by close-spaced sublimation

    Energy Technology Data Exchange (ETDEWEB)

    Moutinho, H.R.; Dhere, R.G.; Al-Jassim, M.M.; Levi, D.H.; Kazmerski, L.L. [National Renewable Energy Laboratory, 1617 Cole Blvd., Golden, Colorado 80401 (United States); Mayo, B. [Southern University and AM College, Harding Boulevard, Baton Rouge, Louisiana 70813 (United States)

    1999-03-01

    We have deposited CdTe thin films by close-spaced sublimation at two different temperature ranges. The films deposited at the lower temperature partially recrystallized after CdCl{sub 2} treatment at 350&hthinsp;{degree}C and completely recrystallized after the same treatment at 400&hthinsp;{degree}C. The films deposited at higher temperature did not recrystallize at these two temperatures. These results confirmed that the mechanisms responsible for changes in physical properties of CdTe films treated with CdCl{sub 2} are recrystallization and grain growth, and provided an alternative method to deposit CSS films using lower temperatures. {copyright} {ital 1999 American Institute of Physics.}

  8. Deposition of highly textured AlN thin films by reactive high power impulse magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Moreira, Milena A. [Department of Solid State Electronics, Ångström Laboratory, Uppsala University, Box 534, SE-752 21 Uppsala, Sweden and School of Electrical and Computer Engineering, University of Campinas, CEP 13.083-852 Campinas-SP (Brazil); Törndahl, Tobias; Katardjiev, Ilia; Kubart, Tomas, E-mail: tomas.kubart@angstrom.uu.se [Department of Solid State Electronics, Ångström Laboratory, Uppsala University, Box 534, SE-752 21 Uppsala (Sweden)

    2015-03-15

    Aluminum nitride thin films were deposited by reactive high power impulse magnetron sputtering (HiPIMS) and pulsed direct-current on Si (100) and textured Mo substrates, where the same deposition conditions were used for both techniques. The films were characterized by x-ray diffraction and atomic force microscopy. The results show a pronounced improvement in the AlN crystalline texture for all films deposited by HiPIMS on Si. Already at room temperature, the HiPIMS films exhibited a strong preferred (002) orientation and at 400 °C, no contributions from other orientations were detected. Despite the low film thickness of only 200 nm, an ω-scan full width at half maximum value of 5.1° was achieved on Si. The results are attributed to the high ionization of sputtered material achieved in HiPIMS. On textured Mo, there was no significant difference between the deposition techniques.

  9. Nanostructured Diamond-Like Carbon Films Grown by Off-Axis Pulsed Laser Deposition

    Directory of Open Access Journals (Sweden)

    Seong Shan Yap

    2015-01-01

    Full Text Available Nanostructured diamond-like carbon (DLC films instead of the ultrasmooth film were obtained by pulsed laser ablation of pyrolytic graphite. Deposition was performed at room temperature in vacuum with substrates placed at off-axis position. The configuration utilized high density plasma plume arriving at low effective angle for the formation of nanostructured DLC. Nanostructures with maximum size of 50 nm were deposited as compared to the ultrasmooth DLC films obtained in a conventional deposition. The Raman spectra of the films confirmed that the films were diamond-like/amorphous in nature. Although grown at an angle, ion energy of >35 eV was obtained at the off-axis position. This was proposed to be responsible for subplantation growth of sp3 hybridized carbon. The condensation of energetic clusters and oblique angle deposition correspondingly gave rise to the formation of nanostructured DLC in this study.

  10. Cu Films Deposited by Unbalanced Magnetron Sputtering Enhanced by ICP and External Magnetic Field Confinement

    Institute of Scientific and Technical Information of China (English)

    QI Xuelian; REN Chunsheng; MA Tengcai; WANG Younian

    2008-01-01

    Metallic copper(Cu) films were deposited on a Si (100) substrate by unbalanced magnetron sputtering enhanced by radio-frequency plasma and external magnetic field confine-ment. The morphology and structure of the films were examined by scanning electron microscopy (SEM), atomic force microscope (AFM) and X-ray diffraction (XRD). The surface average rough-ness of the deposited Cu films was characterized by AFM data and resistivity was measured by a four-point probe. The results show that the Cu films deposited with radio-frequency discharge enhanced ionization and external magnetic field confinement have a smooth surface, low surface roughness and low resistivity. The reasons may be that the radio-frequency discharge and external magnetic field enhance the plasma density, which further improves the ion bombardment effect under the same bias voltage conditions. Ion bombardment can obviously influence the growth features and characteristics of the deposited Cu films.

  11. Substrate dependent structural and magnetic properties of pulsed laser deposited Fe3O4 thin films.

    Science.gov (United States)

    Goyal, Rajendra N; Kaur, Davinder; Pandey, Ashish K

    2010-12-01

    Nanocrystalline iron oxide thin films have been deposited on various substrates such as quartz, MgO(100), and Si(100) by pulsed laser deposition technique using excimer KrF laser (248 nm). The orientations, crystallite size and lattice parameters were studied using X-ray diffraction. The XRD results show that the films deposited on MgO and Si substrates are highly oriented and show only (400) and (311) reflections respectively. On the other hand, the orientation of the films deposited on quarts substrate changed from (311) to (400) with an increase in the substrate temperature from 400 degrees C to 600 degrees C, indicating thereby that the film growth direction is highly affected with nature of substrate and substrate temperature. The surface morphology of the deposited films was studied using Atomic Force Microscopy (AFM) and spherical ball like regular features of nanometer size grains were obtained. The magnetic properties were studied by Superconducting Quantum Interference Device (SQUID) magnetometer in the magnetic field +/- 6 Tesla. The magnetic field dependent magnetization (M-H) curves of all the Fe3O4 thin films measured at 5 K and 300 K show the ferrimagnetic nature. The electrochemical sensing of dopamine studied for these films shows that the film deposited on MgO substrate can be used as a sensing electrode.

  12. Pulsed laser deposition of YBCO films on ISD MgO buffered metal tapes

    CERN Document Server

    Ma, B; Koritala, R E; Fisher, B L; Markowitz, A R; Erck, R A; Baurceanu, R; Dorris, S E; Miller, D J; Balachandran, U

    2003-01-01

    Biaxially textured magnesium oxide (MgO) films deposited by inclined-substrate deposition (ISD) are desirable for rapid production of high-quality template layers for YBCO-coated conductors. High-quality YBCO films were grown on ISD MgO buffered metallic substrates by pulsed laser deposition (PLD). Columnar grains with a roof-tile surface structure were observed in the ISD MgO films. X-ray pole figure analysis revealed that the (002) planes of the ISD MgO films are tilted at an angle from the substrate normal. A small full-width at half maximum (FWHM) of approx 9deg was observed in the phi-scan for ISD MgO films deposited at an inclination angle of 55deg . In-plane texture in the ISD MgO films developed in the first approx 0.5 mu m from the substrate surface, and then stabilized with further increases in film thickness. Yttria-stabilized zirconia and ceria buffer layers were deposited on the ISD MgO grown on metallic substrates prior to the deposition of YBCO by PLD. YBCO films with the c-axis parallel to the...

  13. Nanosecond laser-induced phase transitions in pulsed laser deposition-deposited GeTe films

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Xinxing, E-mail: xinxing.sun@iom-leipzig.de; Thelander, Erik; Lorenz, Pierre; Gerlach, Jürgen W.; Decker, Ulrich; Rauschenbach, Bernd [Leibniz Institute of Surface Modification, Permoserstr. 15, D-04318, Leipzig (Germany)

    2014-10-07

    Phase transformations between amorphous and crystalline states induced by irradiation of pulsed laser deposition grown GeTe thin films with nanosecond laser pulses at 248 nm and pulse duration of 20 ns are studied. Structural and optical properties of the Ge-Te phase-change films were studied by X-ray diffraction and optical reflectivity measurements as a function of the number of laser pulses between 0 and 30 pulses and of the laser fluence up to 195 mJ/cm². A reversible phase transition by using pulse numbers ≥ 5 at a fluence above the threshold fluence between 11 and 14 mJ/cm² for crystallization and single pulses at a fluence between 162 and 182 mJ/cm² for amorphization could be proved. For laser fluences from 36 up to 130 mJ/cm², a high optical contrast of 14.7% between the amorphous and crystalline state is measured. A simple model is used that allows the discussion on the distribution of temperature in dependency on the laser fluence.

  14. Effects of deposition parameters on microstructure and thermal conductivity of diamond films deposited by DC arc plasma jet chemical vapor deposition

    Institute of Scientific and Technical Information of China (English)

    QU Quan-yan; QIU Wan-qi; ZENG De-chang; LIU Zhong-wu; DAI Ming-jiang; ZHOU Ke-song

    2009-01-01

    The uniform diamond films with 60 mm in diameter were deposited by improved DC arc plasma jet chemical vapor deposition technique. The structure of the film was characterized by scanning electronic microcopy(SEM) and laser Raman spectrometry. The thermal conductivity was measured by a photo thermal deflection technique. The effects of main deposition parameters on microstructure and thermal conductivity of the films were investigated. The results show that high thermal conductivity, 10.0 W/(K-cm), can be obtained at a CH4 concentration of 1.5% (volume fraction) and the substrate temperatures of 880-920 ℃ due to the high density and high purity of the film. A low pressure difference between nozzle and vacuum chamber is also beneficial to the high thermal conductivity.

  15. Pulsed laser deposition of barium metaplumbate thin films for ferroelectric capacitors

    Science.gov (United States)

    Mardare, A. I.; Mardare, C. C.; Fernandes, J. R. A.; Vilarinho, P. M.; Joanni, E.

    2003-08-01

    Barium metaplumbate thin films were deposited in situ by pulsed laser deposition on Si/SiO2/Ti/Pt substrates with a high deposition rate. The temperatures used ranged between 400 ^circ C and 700 ^circ C. As the deposition temperature was increased, the films assumed a strong (222) preferential orientation. This orientation of the electrodes was reflected on the PZT films, having a very big influence on their ferroelectric behavior. The PZT films made over BPO deposited at high temperature presented high values of remanent polarization (43 μC/cm^2) but indications of high leakage currents could be observed in the hysteresis loops. By using BPO bottom electrodes, a 30% improvement in the fatigue behavior of PZT capacitors when compared with the normal platinum electrodes was observed.

  16. Pulsed laser deposition of silicon dioxide thin films with silicone targets for fabricating waveguide devices

    Science.gov (United States)

    Okoshi, Masayuki; Kuramatsu, Masaaki; Inoue, Narumi

    2002-06-01

    Silicon dioxide (SiO2) thin films were deposited at room temperature by 193-nm ArF excimer laser ablation of silicone in oxygen atmosphere. Only the side chains of the target were photo-dissociated during ablation to deposit Si-O bonds on a substrate in high laser fluence at about 10 J/cm2. Oxygen gas worked to oxidize the Si-O bonds ejected from the target to from SiO2 thin films at the gas pressure of 4.4 X 10-2 Torr, in addition to reducing the isolated carbon mixed into the films. We also found that the deposited rate could control refractive index of the films. The refractive index of the film deposited at 0.05 nm/pulse is greater than that of the film at 0.1 nm/pulse. Thus, a 0.2-micrometers thick SiO2 cladding film deposited at 0.1 nm/pulse was firstly formed on the whole surface of a 100- micrometers -thick polyester film, and then a 0.6 micrometers -thick SiO2 core film at 0.05 nm/pulse was fabricated in a line on the sample. The sample functioned as a waveguide device for a 633-nm line of He-Ne laser.

  17. Nanostructured and amorphous-like tungsten films grown by pulsed laser deposition

    Science.gov (United States)

    Dellasega, D.; Merlo, G.; Conti, C.; Bottani, C. E.; Passoni, M.

    2012-10-01

    An experimental investigation of nanostructured, micrometer-thick, tungsten films deposited by pulsed laser deposition is presented. The films are compact and pore-free, with crystal grain sizes ranging from 14 nm to less than 2 nm. It is shown how, by properly tailoring deposition rate and kinetic energy of ablated species, it is possible to achieve a detailed and separate control of both film morphology and structure. The role of the main process parameters, He background pressure, laser fluence, and energy, is elucidated. In contrast with W films produced with other PVD techniques, β-phase growth is avoided and the presence of impurities and contaminants, like oxygen, is not correlated with film structure. These features make these films interesting for the development of coatings with improved properties, like increased corrosion resistance and enhanced diffusion barriers.

  18. Influence of bias on properties of carbon films deposited by MCECR plasma sputtering method

    Institute of Scientific and Technical Information of China (English)

    CAI Chang-long; DIAO Dong-feng; S.Miyake; T.Matsumoto

    2004-01-01

    The mirror-confinement-type electron cyclotron resonance(MCECR) plasma source has high plasma density and high electron temperature. It is quite useful in many plasma processing, and has been used for etching and thin-film deposition. The carbon films with 40 nm thickness were deposited by MCECR plasma sputtering method on Si, and the influence of substrate bias on the properties of carbon films was studied. The bonding structure of the film was analyzed by the X-ray photoelectron spectroscopy(XPS), the tribological properties were measured by the pin-on-disk(POD) tribometer, the nanohardness of the films was measured by the nanoindenter, and the deposition speed and the refractive index were measured by the ellipse meter. The better substrate bias was obtained, and the better properties of carbon films were obtained.

  19. Pulsed electron beam deposition of highly oriented thin films of polytetrafluoroethylene

    Energy Technology Data Exchange (ETDEWEB)

    Chandra, Vimlesh [Materials Chemistry Laboratory, Department of Chemistry, Indian Institute of Technology Kanpur, Kanpur 208016 (India); Manoharan, Solomon S. [Materials Chemistry Laboratory, Department of Chemistry, Indian Institute of Technology Kanpur, Kanpur 208016 (India)], E-mail: ssundar@iitk.ac.in

    2008-04-30

    Thin films of polytetrafluoroethylene (PTFE) were deposited by pulsed electron deposition (PED) technique. The transmission electron microscopy (TEM) image of the RT fabricated (20 A thick) film on carbon coated copper grid shows crystalline nature. Infrared spectra show one to one correspondence between PED ablated film and the PTFE bulk target. The asymmetrical and symmetrical -CF{sub 2}- stretching modes were observed at 1220 and 1156 cm{sup -1}, respectively. The -CF{sub 2}- wagging and bending modes occur at 644 and 512 cm{sup -1}, respectively. X-ray diffraction patterns of the film deposited at room temperature (RT) show oriented film along (1 0 0) plane of hexagonal structure and the crystalline nature is retained up to 300 deg. C on vacuum annealing. The room temperature fabricated film shows smooth and pin hole free surface whereas post-annealing brings discontinuity, roughness and pin holes.

  20. Structural and Optical Properties of CdS Thin Film Grown by Chemical Bath Deposition

    Directory of Open Access Journals (Sweden)

    S. Rajpal

    2013-07-01

    Full Text Available In this work we report synthesis and optical characterization of CdS thin films coated on glass substrate. The films were deposited using chemical bath deposition method. Scanning Electron microscopy shows a uniform film of CdS film at particular concentration and dipping time. The Energy Dispersive spectroscopy reveals the presence of Cd and S in the CdS film. X-Ray diffraction confirms the cubic structure of CdS deposited on glass and amorphous nature of glass. Optical and photoluminescence studies were done using UV-Visible spectroscopy and Photoluminescence spectroscopy respectively. We have determined bandgap by analyzing UV-Visible spectra results. Wettability studies were done using Optical Contact Angle, which confirms the hydrophobic nature of the CdS films.

  1. Pulsed electron beam deposition of transparent conducting Al-doped ZnO films

    Energy Technology Data Exchange (ETDEWEB)

    Quang, Pham Hong, E-mail: phquang2711@yahoo.com [Hanoi University of Science, Vietnam National University, Hanoi, 334 Nguyen Trai, Thanh Xuan, Hanoi (Viet Nam); Sang, Ngo Dinh [National University of Civil Engineering, 55 Giai Phong Street, Hai Ba Trung, Hanoi (Viet Nam); Ngoc, Do Quang [Hanoi University of Science, Vietnam National University, Hanoi, 334 Nguyen Trai, Thanh Xuan, Hanoi (Viet Nam)

    2012-08-31

    Good quality transparent conducting Al-doped ZnO films were deposited on quartz substrates from a high purity target using pulsed electron deposition (PED). Two series of films were made, one deposited at room temperature but at four pressures, viz., 0.7, 1.3, 2.0 and 2.7 Pa of oxygen and one deposited at 1.3 Pa oxygen pressure but at the substrate temperature ranged from room temperature to 600 Degree-Sign C. In order to evaluate the effect of substrate temperature and oxygen pressure on the properties of obtained films, various characterization techniques were employed including X-ray diffraction, stylus profiler, scanning electron microscope, optical spectrophotometer and electrical resistivity. For the first series films, the optimal oxygen pressure of 1.3 Pa was found to bring about the appropriate energetic deposition atoms which results in the best crystallinity. For the second series films, the lowest resistivity was obtained in the film grown at 400 Degree-Sign C. An attempt was made to reduce the resistivity by lowering the oxygen pressure to 0.5 Pa which was the lower limit of working pressure of the PED system. The obtained results indicate that PED is a suitable technique for growing transparent conducting ZnO films. - Highlights: Black-Right-Pointing-Pointer Transparent conducting Al-doped ZnO films grown by pulsed electron deposition (PED). Black-Right-Pointing-Pointer The film properties were found to depend strongly on the deposition conditions. Black-Right-Pointing-Pointer The best film was grown at the oxygen pressure of 0.5 Pa and at 400 Degree-Sign C. Black-Right-Pointing-Pointer PED is found to be a suitable technique for growing transparent conducting ZnO films.

  2. Deposition of carbon nitride films for space application

    Institute of Scientific and Technical Information of China (English)

    Feng Yu-Dong; Xu Chao; Wang Yi; Zhang Fu-Jia

    2006-01-01

    Carbon nitride thin films were prepared by electron-beam evaporation assisted with nitrogen ion bombardment and TiN/CNx composite films were by unbalanced dc magnetron sputtering, respectively. It was found that the sputtered films were better than the evaporated films in hardness and adhesion. The experiments of atomic oxygen action, cold welding, friction and wearing were emphasized, and the results proved that the sputtered TiN/CNx composite films were suitable for space application.

  3. Effects of post-deposition argon implantation on the memory properties of plasma-deposited silicon nitride films

    Science.gov (United States)

    Shams, Q. A.; Brown, W. D.

    1989-10-01

    Post-deposition ion implantation has been used to introduce argon into plasma-enhanced chemically vapor deposited silicon nitride films in an attempt to influence the transfer, trapping, and emission of charge during write/erase exercising of the metal-silicon nitride-silicon oxide-silicon structure. Argon was implanted into the SiH4 -NH3 -N2 deposited films at energies ranging from 25 to 75 keV, current densities ranging from 0.1 to 75 μA/cm2 and fluences ranging from 1×1012 to 1×1016 ions/cm2. Physical properties of the films were studied by ellipsometry and infrared spectroscopy, while high frequency capacitance-voltage (C-V) curves were used to obtain programming, retention, and endurance characteristics.

  4. Thickness-dependent stress in plasma-deposited silicon dioxide films

    Science.gov (United States)

    Au, V.; Charles, C.; Bulla, D. A. P.; Love, J. D.; Boswell, R. W.

    2005-04-01

    Thick silicon dioxide (SiO2) films up to 5 μm have been deposited by helicon activated reactive evaporation (plasma assisted deposition with electron beam evaporation source) as both bilayer and trilayer structures, and the film stress was investigated in the context of optical waveguide fabrication. A model for stress in the SiO2-Si bilayer as a function of film thickness is formulated and interpreted in terms of Volmer-Weber film growth mechanisms. We find that island coalescence begins at a film thickness of less than 165 nm and continues until about 700 nm. Above approximately 1 μm thickness, the film continues growth as a continuous film. The stress in a deposited SiO2 film in an SiO2-Si-SiO2 trilayer structure was investigated by adapting the established Stoney's equation for a trilayer system, and comparing it with a thermally grown SiO2 trilayer. A constant value of stress is obtained for the deposited SiO2 film for film thickness >1μm which was consistently less than both measured and previously reported values of stress in thermally grown SiO2.

  5. Deposition of Y thin films by nanosecond UV pulsed laser ablation for photocathode application

    Energy Technology Data Exchange (ETDEWEB)

    Lorusso, A. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Istituto Nazionale di Fisica Nucleare-Lecce, 73100 Lecce (Italy); Anni, M. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Caricato, A.P. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Istituto Nazionale di Fisica Nucleare-Lecce, 73100 Lecce (Italy); Gontad, F., E-mail: francisco.gontad@le.infn.it [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Istituto Nazionale di Fisica Nucleare-Lecce, 73100 Lecce (Italy); Perulli, A. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Taurino, A. [National Research Council, Institute for Microelectronics & Microsystems, 73100 Lecce (Italy); Perrone, A. [Università del Salento, Dipartimento di Matematica e Fisica “E. De Giorgi”, 73100 Lecce (Italy); Istituto Nazionale di Fisica Nucleare-Lecce, 73100 Lecce (Italy); Chiadroni, E. [Laboratori Nazionali di Frascati, Istituto Nazionale di Fisica Nucleare, 00044 Frascati (Italy)

    2016-03-31

    In this work, yttrium (Y) thin films have been deposited on Si (100) substrates by the pulsed laser deposition technique. Ex-situ morphological, structural and optical characterisations of such films have been performed by scanning electron microscopy, X-ray diffractometry, atomic force microscopy and ellipsometry. Polycrystalline films with a thickness of 1.2 μm, homogenous with a root mean square roughness of about 2 nm, were obtained by optimised laser irradiation conditions. Despite the relatively high thickness, the films resulted very adherent to the substrates. The high quality of such thin films is important to the synthesis of metallic photocathodes based on Y thin film, which could be used as electron sources of high photoemission performance in radio-frequency guns. - Highlights: • Pulsed laser deposition of Yttrium thin films is investigated. • 1.2 μm thick films were deposited with very low RMS roughness. • The Y thin films were very adherent to the Si substrate • Optical characterisation showed a very high absorption coefficient for the films.

  6. Aerosol assisted chemical vapour deposition of germanium thin films using organogermanium carboxylates as precursors and formation of germania films

    Indian Academy of Sciences (India)

    Alpa Y Shah; Amey Wadawale; Vijaykumar S Sagoria; Vimal K Jain; C A Betty; S Bhattacharya

    2012-06-01

    Diethyl germanium bis-picolinate, [Et2Ge(O2CC5H4N)2], and trimethyl germanium quinaldate, [Me3Ge(O2CC9H6N)], have been used as precursors for deposition of thin films of germanium by aerosol assisted chemical vapour deposition (AACVD). The thermogravimetric analysis revealed complete volatilization of complexes under nitrogen atmosphere. Germanium thin films were deposited on silicon wafers at 700°C employing AACVD method. These films on oxidation under an oxygen atmosphere at 600°C yield GeO2. Both Ge and GeO2 films were characterized by XRD, SEM and EDS measurements. Their electrical properties were assessed by current–voltage (–) characterization.

  7. Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition.

    Science.gov (United States)

    Zhai, Chen-Hui; Zhang, Rong-Jun; Chen, Xin; Zheng, Yu-Xiang; Wang, Song-You; Liu, Juan; Dai, Ning; Chen, Liang-Yao

    2016-12-01

    The tuning of structural, optical, and electrical properties of Al-doped ZnO films deposited by atomic layer deposition technique is reported in this work. With the increasing Al doping level, the evolution from (002) to (100) diffraction peaks indicates the change in growth mode of ZnO films. Spectroscopic ellipsometry has been applied to study the thickness, optical constants, and band gap of AZO films. Due to the increasing carrier concentration after Al doping, a blue shift of band gap and absorption edge can be observed, which can be interpreted by Burstein-Moss effect. The carrier concentration and resistivity are found to vary significantly among different doping concentration, and the optimum value is also discussed. The modulations and improvements of properties are important for Al-doped ZnO films to apply as transparent conductor in various applications.

  8. Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition

    Science.gov (United States)

    Zhai, Chen-Hui; Zhang, Rong-Jun; Chen, Xin; Zheng, Yu-Xiang; Wang, Song-You; Liu, Juan; Dai, Ning; Chen, Liang-Yao

    2016-09-01

    The tuning of structural, optical, and electrical properties of Al-doped ZnO films deposited by atomic layer deposition technique is reported in this work. With the increasing Al doping level, the evolution from (002) to (100) diffraction peaks indicates the change in growth mode of ZnO films. Spectroscopic ellipsometry has been applied to study the thickness, optical constants, and band gap of AZO films. Due to the increasing carrier concentration after Al doping, a blue shift of band gap and absorption edge can be observed, which can be interpreted by Burstein-Moss effect. The carrier concentration and resistivity are found to vary significantly among different doping concentration, and the optimum value is also discussed. The modulations and improvements of properties are important for Al-doped ZnO films to apply as transparent conductor in various applications.

  9. High deposition rate processes for the fabrication of microcrystalline silicon thin films

    Energy Technology Data Exchange (ETDEWEB)

    Michard, S. [Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Jülich, 52425 Jülich (Germany); Meier, M., E-mail: ma.meier@fz-juelich.de [Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Jülich, 52425 Jülich (Germany); Grootoonk, B.; Astakhov, O.; Gordijn, A.; Finger, F. [Institute of Energy and Climate Research 5 - Photovoltaik, Forschungszentrum Jülich, 52425 Jülich (Germany)

    2013-05-15

    The increase of deposition rate of microcrystalline silicon absorber layers is an essential point for cost reduction in the mass production of thin-film silicon solar cells. In this work we explored a broad range of plasma enhanced chemical vapor deposition (PECVD) parameters in order to increase the deposition rate of intrinsic microcrystalline silicon layers keeping the industrial relevant material quality standards. We combined plasma excitation frequencies in the VHF band with the high pressure high power depletion regime using new deposition facilities and achieved deposition rates as high as 2.8 nm/s. The material quality evaluated from photosensitivity and electron spin resonance measurements is similar to standard microcrystalline silicon deposited at low growth rates. The influence of the deposition power and the deposition pressure on the electrical and structural film properties was investigated.

  10. Ion beams as a means of deposition and in-situ characterization of thin films and thin film layered structures

    Energy Technology Data Exchange (ETDEWEB)

    Krauss, A.R.; Rangaswamy, M.; Gruen, D.M. [Argonne National Lab., IL (United States); Lin, Y.P. [Argonne National Lab., IL (United States)]|[Northwestern Univ., Evanston, IL (United States). Dept. of Materials Science; Schultz, J.A. [Ionwerks, Inc., Houston, TX (United States); Schmidt, H. [Schmidt Instruments, Inc., Houston, TX (United States); Liu, Y.L. [Argonne National Lab., IL (United States)]|[Wisconsin Univ., Milwaukee, WI (United States). Dept. of Materials Science; Auciello, O. [Microelectronics Center of North Carolina, Research Triangle Park, NC (United States); Barr, T. [Wisconsin Univ., Milwaukee, WI (United States). Dept. of Materials Science; Chang, R.P.H. [Northwestern Univ., Evanston, IL (United States). Dept. of Materials Science

    1992-08-01

    Ion beam-surface interactions produce many effects in thin film deposition which are similar to those encountered in plasma deposition processes. However, because of the lower pressures and higher directionality associated with the ion beam process, it is easier to avoid some sources of film contamination and to provide better control of ion energies and fluxes. Additional effects occur in the ion beam process because of the relatively small degree of thermalization resulting from gas phase collisions with both the ion beam and atoms sputtered from the target. These effects may be either beneficial or detrimental to the film properties, depending on the material and deposition conditions. Ion beam deposition is particularly suited to the deposition of multi-component films and layered structures, and can in principle be extended to a complete device fabrication process. However, complex phenomena occur in the deposition of many materials of high technical interest which make it desirable to monitor the film growth at the monolayer level. It is possible to make use of ion-surface interactions to provide a full suite of surface analytical capabilities in one instrument, and this data may be obtained at ambient pressures which are far too high for conventional surface analysis techniques. Such an instrument is under development and its current performance characteristics and anticipated capabilities are described.

  11. Investigations of ZnO thin films deposited by a reactive pulsed laser ablation

    Institute of Scientific and Technical Information of China (English)

    Y.; C.; SOO; H.; KANDEL; M.; A.; THOMAS; C.; P.; DAGHLIAN

    2009-01-01

    Highly transparent ZnO thin films were deposited at different substrate temperatures by pulsed laser deposition in an oxygen atmosphere. The thin films were characterized by various techniques including X-ray diffraction, scanning electron microscopy, optical absorption, and photoluminescence. We demonstrated that oriented wurtzite ZnO thin films could be deposited at room temperature using a high purity zinc target. Variable temperature photoluminescence revealed new characteristics in the band edge emission. The underlying mechanism for the observed phenomena was also discussed.

  12. Surface Acoustic Wave Monitor for Deposition and Analysis of Ultra-Thin Films

    Science.gov (United States)

    Hines, Jacqueline H. (Inventor)

    2015-01-01

    A surface acoustic wave (SAW) based thin film deposition monitor device and system for monitoring the deposition of ultra-thin films and nanomaterials and the analysis thereof is characterized by acoustic wave device embodiments that include differential delay line device designs, and which can optionally have integral reference devices fabricated on the same substrate as the sensing device, or on a separate device in thermal contact with the film monitoring/analysis device, in order to provide inherently temperature compensated measurements. These deposition monitor and analysis devices can include inherent temperature compensation, higher sensitivity to surface interactions than quartz crystal microbalance (QCM) devices, and the ability to operate at extreme temperatures.

  13. Underpotential deposition-mediated layer-by-layer growth of thin films

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Jia Xu; Adzic, Radoslav R.

    2017-06-27

    A method of depositing contiguous, conformal submonolayer-to-multilayer thin films with atomic-level control is described. The process involves electrochemically exchanging a mediating element on a substrate with a noble metal film by alternatingly sweeping potential in forward and reverse directions for a predetermined number of times in an electrochemical cell. By cycling the applied voltage between the bulk deposition potential for the mediating element and the material to be deposited, repeated desorption/adsorption of the mediating element during each potential cycle can be used to precisely control film growth on a layer-by-layer basis.

  14. Thin films deposited by femtosecond pulsed laser ablation of tungsten carbide

    Science.gov (United States)

    De Bonis, A.; Teghil, R.; Santagata, A.; Galasso, A.; Rau, J. V.

    2012-09-01

    Ultra-short Pulsed Laser Deposition has been applied to the production of thin films from a tungsten carbide target. The gaseous phase obtained by the laser ablation shows a very weak primary plume, in contrast with a very strong secondary one. The deposited films, investigated by Scanning Electron Microscopy, Atomic Force Microscopy, X-Ray Photoelectron Spectroscopy and X-Ray Diffraction, present a mixture of WC and other phases with lower carbon content. All films are amorphous, independently from the substrate temperature. The characteristics of the deposits have been explained in terms of thermal evaporation and cooling rate of molten particles ejected from the target.

  15. PbS Thin Films for Photovoltaic Applications Obtained by Non-Traditional Chemical Bath Deposition

    OpenAIRE

    2015-01-01

    To optimize cost-efficiency relation for thin film solar cells, we explore the recently developed versions of chemical deposition of semiconductor films, together with classic CBD (Chemical Bath Deposition): SILAR (Successive Ionic Layer Adsorption and Reaction) and PCBD (Photo Chemical Bath Deposition), all of them ammonia-free and ecologically friendly. The films of CdS and PbS were made, and experimental solar cells with CdS window layer and PbS absorber elaborated. We found that band gap ...

  16. The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties

    Directory of Open Access Journals (Sweden)

    Velaphi Msomi

    2010-10-01

    Full Text Available Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 °C to 550 °C, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011 plane, indicating the presence of vanadium dioxide.

  17. Structural and Magnetic Properties of Mn doped ZnO Thin Film Deposited by Pulsed Laser Deposition

    KAUST Repository

    Baras, Abdulaziz

    2011-07-01

    Diluted magnetic oxide (DMO) research is a growing field of interdisciplinary study like spintronic devices and medical imaging. A definite agreement among researchers concerning the origin of ferromagnetism in DMO has yet to be reached. This thesis presents a study on the structural and magnetic properties of DMO thin films. It attempts to contribute to the understanding of ferromagnetism (FM) origin in DMO. Pure ZnO and Mn doped ZnO thin films have been deposited by pulsed laser deposition (PLD) using different deposition conditions. This was conducted in order to correlate the change between structural and magnetic properties. Structural properties of the films were characterized using x-ray diffraction (XRD) and scanning electron microscopy (SEM). The superconducting quantum interference device (SQUID) was used to investigate the magnetic properties of these films. The structural characterizations showed that the quality of pure ZnO and Mn doped ZnO films increased as oxygen pressure (PO) increased during deposition. All samples were insulators. In Mn doped films, Mn concentration decreased as PO increased. The Mn doped ZnO samples were deposited at 600˚C and oxygen pressure from 50-500mTorr. All Mn doped films displayed room temperature ferromagnetism (RTFM). However, at 5 K a superparamagnetic (SPM) behavior was observed in these samples. This result was accounted for by the supposition that there were secondary phase(s) causing the superparamagnetic behavior. Our findings hope to strengthen existing research on DMO origins and suggest that secondary phases are the core components that suppress the ferromagnetism. Although RTFM and SPM at low temperature has been observed in other systems (e.g., Co doped ZnO), we are the first to report this behavior in Mn doped ZnO. Future research might extend the characterization and exploration of ferromagnetism in this system.

  18. Atomic Layer Deposition Films as Diffusion Barriers for Silver Artifacts

    Science.gov (United States)

    Marquardt, Amy; Breitung, Eric; Drayman-Weisser, Terry; Gates, Glenn; Rubloff, Gary W.; Phaneuf, Ray J.

    2012-02-01

    Atomic layer deposition (ALD) was investigated as a means to create transparent oxide diffusion barrier coatings to reduce the rate of tarnishing for silver objects in museum collections. Accelerated aging by heating various thicknesses (5 to 100nm) of ALD alumina (Al2O3) thin films on sterling and fine silver was used to determine the effectiveness of alumina as a barrier to silver oxidation. The effect of aging temperature on the thickness of the tarnish layer (Ag2S) created at the interface of the ALD coating and the bulk silver substrate was determined by reflectance spectroscopy and X-Ray Photoelectric Spectroscopy (XPS). Reflectance spectroscopy was an effective rapid screening tool to determine tarnishing rates and the coating's visual impact. X-Ray Photoelectric Spectroscopy (XPS), and Time of Flight Secondary Ion Mass Spectroscopy (ToF-SIMS) analysis showed a phase transformation in the Ag2S tarnish layer at 177 C and saturation in the thickness of the silver sulfide layer, indicating possible self-passivation of the tarnish layer.

  19. Laser diagnostics of chemical vapour deposition of diamond films

    CERN Document Server

    Wills, J B

    2002-01-01

    Cavity ring down spectroscopy (CRDS) has been used to make diagnostic measurements of chemically activated CH sub 4 / H sub 2 gas mixtures during the chemical vapour deposition (CVD) of thin diamond films. Absolute absorbances, concentrations and temperatures are presented for CH sub 3 , NH and C sub 2 H sub 2 in a hot filament (HF) activated gas mixture and CH, C sub 2 and C sub 2 H sub 2 in a DC arc plasma jet activated mixture. Measurements of the radical species were made using a pulsed dye laser system to generate tuneable visible and UV wavelengths. These species have greatest concentration in the hottest, activated regions of the reactors. Spatial profiling of the number densities of CH sub 3 and NH radicals have been used as stringent tests of predictions of radical absorbance and number densities made by 3-D numerical simulations, with near quantitative agreement. O sub 2 has been shown to reside in the activated region of the Bristol DC arc jet at concentrations (approx 10 sup 1 sup 3 molecules / cm...

  20. PbTe thin films grown by femtosecond pulsed laser deposition

    Science.gov (United States)

    Rodriguez, E.; Silva, D.; Moya, L.; Cesar, C. L.; Barbosa, L. C.; Schrank, A.; Souza Filho, C. R.; de Oliveira, E. P.

    2007-09-01

    PbTe thin films were grown on BK7 glass and Si(100) substrates using femtosecond pulsed laser deposition at room temperature. The influence of the background pressure and the laser fluence on the structural and optical characteristics of the PbTe films was studied. Scanning electron microscopy (SEM) and X-ray diffraction (XRD) were used to characterize the surface and structural properties of the deposited PbTe thin films, respectively. Transmission spectroscopy measurements in the visible and infrared region (VIS-IR) were used to investigate the optical properties of the PbTe thin films.

  1. Nano-scratch study of molecular deposition (MD) films on silicon wafer using nanoindentation~1

    Institute of Scientific and Technical Information of China (English)

    2001-01-01

    Experiment of the molecular deposition (MD) films with and without alkyl terminal de-posited on the silicon wafer were conducted by using nanoindentation. It was found that MD filmsand alkyl terminated MD films exhibit higher critical load (scratch resistance or adhesive strength)and lower coefficient of friction compared with the silicon substrate. Critical load (scratch resis-tance) increases with the number of layers, and coefficients of friction of those MD film with alkylterminal are still best for the same layer of MD film.

  2. PZT thin film deposition techniques, properties and its application in ultrasonic MEMS sensors: a review

    Science.gov (United States)

    Shilpa, G. D.; Sreelakshmi, K.; Ananthaprasad, M. G.

    2016-09-01

    This paper describes an overview of the state of art in PbZrxTi1-xO3 (PZT)ferroelectric thin films and its applications in Micro Electro Mechanical Systems (MEMS). First, the deposition techniques and then the important properties of PZT films such as surface morphology polarization and ferroelectric properties are reviewed. Two major deposition techniques such as sol-gel and Magnetron sputtering are given and compared for the film surface morphology and ferroelectric properties. Finally, the application of PZT thin film in MEMS ultrasonic sensors is discussed.

  3. Effect of target density on the growth and properties of YGBCO thin films deposited by pulsed laser deposition

    Science.gov (United States)

    Liu, Linfei; Li, Yiejie; Wu, Xiang; Yao, Yanjie; Wang, Menglin; Wang, Binbin

    2016-12-01

    Some works found that target density had not a large effects on the superconducting or structural properties of YBa2Cu3O7-δ (YBCO) films prepared by pulsed laser deposition. However, the possible effect of target density on the Y0.5Gd0.5Ba2Cu3O7-δ (YGBCO) is not clear. In this paper, YGBCO thin films were deposited on flexible metal substrates by pulsed laser deposition using target with different densities. The density of each YGBCO target was varied from to 4.0 g/cm3 to 5.5 g/cm3. The aim of this study was to determine the relationship between the microstructure and superconducting properties of YGBCO films as a function of the target density. The film structures were examined by X-ray diffraction and field emission scanning electron microscopy. The superconducting properties of the YGBCO films were evaluated using the conventional four-probe method and PPMS. It was found that all the YGBCO films had pure c-axis orientation. The target density had effect on the surface morphology and superconducting properties of the YGBCO thin films. With increasing target density, the pore became larger and the distribution density and size of the particles became higher and larger, and the critical current Ic decreased. The YGBCO film deposited at a target density of 4.0 g/cm3 exhibited the highest critical current density Jc of 5.4 MA/cm2 at 77 K and self-field, 47.2 MA/cm2 at 0 T and 8.8 MA/cm2 at 9 T at 4.2 K and B//c.

  4. MgB{sub 2} thin films by hybrid physical-chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Xi, X.X. [Department of Physics, Pennsylvania State University, University Park, PA 16802 (United States)]|[Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802 (United States)]. E-mail: xxx4@psu.edu; Pogrebnyakov, A.V. [Department of Physics, Pennsylvania State University, University Park, PA 16802 (United States)]|[Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802 (United States); Xu, S.Y.; Chen, K.; Cui, Y.; Maertz, E.C. [Department of Physics, Pennsylvania State University, University Park, PA 16802 (United States); Zhuang, C.G. [Department of Physics, Pennsylvania State University, University Park, PA 16802 (United States)]|[Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802 (United States)]|[Department of Physics, Peking University, Beijing 100871 (China); Li, Qi [Department of Physics, Pennsylvania State University, University Park, PA 16802 (United States); Lamborn, D.R. [Department of Chemical Engineering, Pennsylvania State University, University Park, PA 16802 (United States); Redwing, J.M. [Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802 (United States)]|[Department of Chemical Engineering, Pennsylvania State University, University Park, PA 16802 (United States); Liu, Z.K.; Soukiassian, A.; Schlom, D.G.; Weng, X.J.; Dickey, E.C. [Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802 (United States); Chen, Y.B.; Tian, W.; Pan, X.Q. [Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109 (United States); Cybart, S.A. [Department of Physics, University of California, Berkeley, CA 94720 (United States); Dynes, R.C. [Department of Physics, University of California, Berkeley, CA 94720 (United States)

    2007-06-01

    Hybrid physical-chemical vapor deposition (HPCVD) has been the most effective technique for depositing MgB{sub 2} thin films. It generates high magnesium vapor pressures and provides a clean environment for the growth of high purity MgB{sub 2} films. The epitaxial pure MgB{sub 2} films grown by HPCVD show higher-than-bulk T {sub c} due to tensile strain in the films. The HPCVD films are the cleanest MgB{sub 2} materials reported, allowing basic research, such as on magnetoresistance, that reveals the two-band nature of MgB{sub 2}. The carbon-alloyed HPCVD films demonstrate record-high H {sub c2} values promising for high magnetic field applications. The HPCVD films and multilayers have enabled the fabrication of high quality MgB{sub 2} Josephson junctions.

  5. Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor

    Energy Technology Data Exchange (ETDEWEB)

    Suh, Sungin; Kim, Jun-Rae; Kim, Seongkyung; Hwang, Cheol Seong; Kim, Hyeong Joon, E-mail: thinfilm@snu.ac.kr [Department of Materials Science and Engineering with Inter-University Semiconductor Research Center (ISRC), Seoul National University, 599 Gwanak-ro, Gwanak-gu, Seoul 08826 (Korea, Republic of); Ryu, Seung Wook, E-mail: tazryu78@gmail.com [Department of Electrical Engineering, Stanford University, Stanford, California 94305-2311 (United States); Cho, Seongjae [Department of Electronic Engineering and New Technology Component & Material Research Center (NCMRC), Gachon University, Seongnam-si, Gyeonggi-do 13120 (Korea, Republic of)

    2016-01-15

    It has not been an easy task to deposit SiN at low temperature by conventional plasma-enhanced atomic layer deposition (PE-ALD) since Si organic precursors generally have high activation energy for adsorption of the Si atoms on the Si-N networks. In this work, in order to achieve successful deposition of SiN film at low temperature, the plasma processing steps in the PE-ALD have been modified for easier activation of Si precursors. In this modification, the efficiency of chemisorption of Si precursor has been improved by additional plasma steps after purging of the Si precursor. As the result, the SiN films prepared by the modified PE-ALD processes demonstrated higher purity of Si and N atoms with unwanted impurities such as C and O having below 10 at. % and Si-rich films could be formed consequently. Also, a very high step coverage ratio of 97% was obtained. Furthermore, the process-optimized SiN film showed a permissible charge-trapping capability with a wide memory window of 3.1 V when a capacitor structure was fabricated and measured with an insertion of the SiN film as the charge-trap layer. The modified PE-ALD process using the activated Si precursor would be one of the most practical and promising solutions for SiN deposition with lower thermal budget and higher cost-effectiveness.

  6. Vanadium dioxide film protected with an atomic-layer-deposited Al{sub 2}O{sub 3} thin film

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Xiao; Cao, Yunzhen, E-mail: yzhcao@mail.sic.ac.cn; Yang, Chao; Yan, Lu; Li, Ying [Key Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, 588 Heshuo Road, Shanghai 201800 (China)

    2016-01-15

    A VO{sub 2} film exposed to ambient air is prone to oxidation, which will degrade its thermochromic properties. In this work, the authors deposited an ultrathin Al{sub 2}O{sub 3} film with atomic layer deposition (ALD) to protect the underlying VO{sub 2} film from degradation, and then studied the morphology and crystalline structure of the films. To assess the protectiveness of the Al{sub 2}O{sub 3} capping layer, the authors performed a heating test and a damp heating test. An ultrathin 5-nm-thick ALD Al{sub 2}O{sub 3} film was sufficient to protect the underlying VO{sub 2} film heated at 350 °C. However, in a humid environment at prolonged durations, a thicker ALD Al{sub 2}O{sub 3} film (15 nm) was required to protect the VO{sub 2}. The authors also deposited and studied a TiO{sub 2}/Al{sub 2}O{sub 3} bilayer, which significantly improved the protectiveness of the Al{sub 2}O{sub 3} film in a humid environment.

  7. Electrochemical preparation of lead-doped amorphous Se films and underpotential deposition of lead onto these films

    Science.gov (United States)

    Ivanov, Dmitry K.; Osipovich, Nikolay P.; Poznyak, Sergey K.; Streltsov, Eugene A.

    2003-06-01

    The process of the underpotential deposition (UPD) of Pb adatoms (Pb ad) onto Se was used to produce nanocomposite films consisting of amorphous Se and nanosized PbSe clusters distributed throughout the film bulk. It was found that doping lead into Se films modifies their optical and photoelectrochemical properties and increases the efficiency of the charge transfer both in the film bulk and through the semiconductor | electrolyte interface. Introducing lead into the bulk of Se films significantly promotes the process of Pb ad UPD onto Se surface. The underpotentially deposited Pb ad interact chemically with Se surface atoms, resulting in the formation of a PbSe monolayer. The PbSe formed can be identified by the anodic peak corresponding to its electrochemical oxidation.

  8. Amorphous Silicon Film Deposition from SiH4 by Chemical Vapor Deposition with Argon Excimer Lamp

    Science.gov (United States)

    Toshikawa, Kiyohiko; Yokotani, Atsushi; Kurosawa, Kou

    2005-11-01

    We have deposited amorphous silicon thin films from monosilane (SiH4) gas by photochemical vapor deposition using a vacuum ultraviolet excimer lamp (VUV-CVD). We used an argon excimer lamp (λ=126 nm, hν=9.8 eV) whose photons are strongly absorbed by SiH4 gas. The substrate temperatures were changed from 25 to 300°C. When the temperature was lower than 150°C, the films included H--Si--H units and H2 molecules in its structure. When it was higher than 150°C, the main structural unit was Si--H.

  9. Spray Deposition of High Quality CuInSe2 and CdTe Films: Preprint

    Energy Technology Data Exchange (ETDEWEB)

    Curtis, C. J.; van Hest, M.; Miedaner, A.; Leisch, J.; Hersh, P.; Nekuda, J.; Ginley, D. S.

    2008-05-01

    A number of different ink and deposition approaches have been used for the deposition of CuInSe2 (CIS), Cu(In,Ga)Se2 (CIGS), and CdTe films. For CIS and CIGS, soluble precursors containing Cu, In, and Ga have been developed and used in two ways to produce CIS films. In the first, In-containing precursor films were sprayed on Mo-coated glass substrates and converted by rapid thermal processing (RTP) to In2Se3. Then a Cu-containing film was sprayed down on top of the In2Se3 and the stacked films were again thermally processed to give CIS. In the second approach, the Cu-, In-, and Ga-containing inks were combined in the proper ratio to produce a mixed Cu-In-Ga ink that was sprayed on substrates and thermally processed to give CIGS films directly. For CdTe deposition, ink consisting of CdTe nanoparticles dispersed in methanol was prepared and used to spray precursor films. Annealing these precursor films in the presence of CdCl2 produced large-grained CdTe films. The films were characterized by x-ray diffraction (XRD) and scanning electron microscopy (SEM). Optimized spray and processing conditions are crucial to obtain dense, crystalline films.

  10. Physical properties of a non-transparent cadmium oxide thick film deposited at low fluence by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Quiñones-Galván, J.G., E-mail: erk_183@hotmail.com [Departamento de Física, Centro Universitario de Ciencias Exactas e Ingenierías, Universidad de Guadalajara, Boulevard Marcelino García Barragán 1421, Guadalajara, Jalisco C.P. 44430 (Mexico); Lozada-Morales, R. [Facultad de Ciencias Físico-Matemáticas, Postgrado en Física Aplicada, Benemérita Universidad Autónoma de Puebla, Av. 14 sur y Av. San Claudio, Col. San Manuel, Puebla (Mexico); Jiménez-Sandoval, S. [Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional, Unidad Querétaro, Apartado Postal 1-798 Querétaro, Qro 76001 (Mexico); Camps, Enrique [Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apartado postal 18-1027, México D.F. C.P. 11801 (Mexico); and others

    2016-04-15

    Highlights: • A non-transparent cadmium oxide film has been deposited by pulsed laser deposition. • The CdO film is polycrystalline and highly oriented in the (2 0 0) direction. • Thermal treatment was applied in order to see the effect on its physical properties. - Abstract: A stable non-transparent CdO film was grown by pulsed laser deposition. The sample was thermally annealed at 500 °C in air. A (2 0 0) highly oriented polycrystalline film was obtained. The annealed sample has not preferred orientation. Scanning electron micrographs show a grain size reduction for the annealed sample. By Raman spectroscopy, the defects related second order vibrational modes of CdO were observed. Chemical composition analysis shows the presence of CdO together with a substoichiometric CdO{sub x} phase for the as-grown sample. For the annealed sample a compensation of oxygen vacancies was observed. Electrical resistivity measurements give a value of 8.602 × 10{sup −4} (Ω cm) for the as-grown film. For the annealed sample the electrical resistivity increased to a value of 9.996 × 10{sup −3} (Ω cm). Zero transmission has never been reported for CdO films. The photoluminescence spectra were measured in order to shed some light on the origin of the zero transmission.

  11. Spray pyrolytic deposition of polycrystalline Cu{sub 2}S thin films

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Woo-Young [Clean Energy Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650 (Korea, Republic of); Palve, Balasaheb M. [Department of Physics, University of Pune, Pune 411 007 (India); Pathan, Habib M. [Clean Energy Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650 (Korea, Republic of); Department of Physics, University of Pune, Pune 411 007 (India); Joo, Oh-Shim, E-mail: joocat@kist.re.kr [Clean Energy Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650 (Korea, Republic of)

    2011-12-15

    Highlights: Black-Right-Pointing-Pointer Synthesis of polycrystalline Cu{sub 2}S films with band gap of 1.5 eV which is truly useful for solar cell applications. Black-Right-Pointing-Pointer Deposition has been carried out without any complexing agent. Black-Right-Pointing-Pointer Films are compact. - Abstract: Polycrystalline copper sulfide (Cu{sub 2}S) thin films were deposited by spray pyrolysis using aqueous solutions of copper nitrate and thiourea without any complexing agent at substrate (deposition) temperature of {approx}200 Degree-Sign C. The films were deposited onto glass and ITO-coated glass substrates. The deposited films were observed to be blackish brown in color, well adherent to the substrate, pin-hole free and uniform. The structural, surface morphological and optical properties of the films were carried out by means of X-ray diffraction, scanning electron microscopy and optical absorbance measurement techniques. XRD analysis showed that deposited films are chemically close to chalcocite, Cu{sub 2}S. The optical band gap was calculated to be 1.5 eV.

  12. Optical Properties Dependence with Gas Pressure in AlN Films Deposited by Pulsed Laser Ablation

    Energy Technology Data Exchange (ETDEWEB)

    Perez, J A; Riascos, H [Departamento de Fisica, Universidad Tecnologica de Pereira, Grupo plasma Laser y Aplicaciones A.A 097 (Colombia); Caicedo, J C [Grupo pelIculas delgadas, Universidad del Valle, Cali (Colombia); Cabrera, G; Yate, L, E-mail: jcaicedoangulo@gmail.com [Department de Fisica Aplicada i Optica, Universitat de Barcelona, Catalunya (Spain)

    2011-01-01

    AlN films were deposited by pulsed laser deposition technique (PLD) using an Nd: YAG laser ({lambda} = 1064 nm). The films were deposited in a nitrogen atmosphere as working gas; the target was an aluminum high purity (99.99%). The films were deposited with a laser fluence of 7 J/cm2 for 10 minutes on silicon (100) substrates. The substrate temperature was 300 deg. C and the working pressure was varied from 3 mtorr to 11 mtorr. The thickness measured by profilometer was 150 nm for all films. The crystallinity was observed via XRD pattern, the morphology and composition of the films were studied using scanning electron microscopy (SEM) and Energy Dispersive X-ray analysis (EDX), respectively. The optical reflectance spectra and color coordinates of the films were obtained by optical spectral reflectometry technique in the range of 400 cm-1- 900 cm-1 by an Ocean Optics 2000 spectrophotometer. In this work, a clear dependence of the reflectance, dominant wavelength and color purity was found in terms of the applied pressure to the AlN films. A reduction in reflectance of about 55% when the pressure was increased from 3 mtorr to 11 mtorr was observed. This paper deals with the formation of AlN thin films as promising materials for the integration of SAW devices on Si substrates due to their good piezoelectric properties and the possibility of deposition at low temperature compatible with the manufacturing of Si integrated circuits.

  13. Low temperature temporal and spatial atomic layer deposition of TiO{sub 2} films

    Energy Technology Data Exchange (ETDEWEB)

    Aghaee, Morteza, E-mail: m.aghaee@tue.nl; Maydannik, Philipp S. [ASTRaL Group, Laboratory of Green Chemistry, Lappeenranta University of Technology, Sammonkatu 12, 50130 Mikkeli (Finland); Johansson, Petri; Kuusipalo, Jurkka [Paper Converting and Packaging Technology, Tampere University of Technology, P.O. Box 541, FI-33101 Tampere (Finland); Creatore, Mariadriana [Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands); Homola, Tomáš; Cameron, David C. [R& D Center for Low-Cost Plasma and Nanotechnology Surface Modification, Masaryk University, Kotlářská 2, 611 37 Brno (Czech Republic)

    2015-07-15

    Titanium dioxide films were grown by atomic layer deposition (ALD) using titanium tetraisopropoxide as a titanium precursor and water, ozone, or oxygen plasma as coreactants. Low temperatures (80–120 °C) were used to grow moisture barrier TiO{sub 2} films on polyethylene naphthalate. The maximum growth per cycle for water, ozone, and oxygen plasma processes were 0.33, 0.12, and 0.56 Å/cycle, respectively. X-ray photoelectron spectrometry was used to evaluate the chemical composition of the layers and the origin of the carbon contamination was studied by deconvoluting carbon C1s peaks. In plasma-assisted ALD, the film properties were dependent on the energy dose supplied by the plasma. TiO{sub 2} films were also successfully deposited by using a spatial ALD (SALD) system based on the results from the temporal ALD. Similar properties were measured compared to the temporal ALD deposited TiO{sub 2}, but the deposition time could be reduced using SALD. The TiO{sub 2} films deposited by plasma-assisted ALD showed better moisture barrier properties than the layers deposited by thermal processes. Water vapor transmission rate values lower than 5 × 10{sup −4} g day{sup −1} m{sup −2} (38 °C and 90% RH) was measured for 20 nm of TiO{sub 2} film deposited by plasma-assisted ALD.

  14. Achieving Thin Films with Micro/Nano-Scale Controllable Morphology by Glancing Angle Deposition Technique

    Institute of Scientific and Technical Information of China (English)

    JIANG Shao-Ji; WANG Chao-Yi; TANG Ji-Jia; HU Lin-Xin

    2008-01-01

    @@ We demonstrate that thin films with micro/nanometre controllable morphology can be fabricated by the glancing angle deposition (GLAD) technique which is a physical vapour deposition technique.In this technique, there are parameters which determine the morphology of the thin films: the incident angle, ratio of the deposition rate with respect to the substrate rotation rate, nature of the material being deposited, etc.We fabricate the morphology of column, pillar, helices, zigzag and study the parameters which determine morphology by given some examples of SEM.

  15. UV optical properties of thin film oxide layers deposited by different processes.

    Science.gov (United States)

    Pellicori, Samuel F; Martinez, Carol L

    2011-10-01

    UV optical properties of thin film layers of compound and mixed oxide materials deposited by different processes are presented. Japan Electron Optics Laboratory plasma ion assisted deposition (JEOL PIAD), electron beam with and without IAD, and pulsed DC magnetron sputtering were used. Comparisons are made with published deposition process data. Refractive indices and absorption values to as short as 145 nm were measured by spectroscopic ellipsometry (SE). Electronic interband defect states are detected that are deposition-process dependent. SE might be effective in identifying UV optical film quality, especially in defining processes and material composition beneficial for high-energy excimer laser applications and environments requiring stable optical properties.

  16. Investigation on the pure and fluorine doped vanadium oxide thin films deposited by spray pyrolysis method

    Energy Technology Data Exchange (ETDEWEB)

    Margoni, Mudaliar Mahesh; Mathuri, S. [Crystal Growth and Thin Film Laboratory, Department of Physics and Nanotechnology, Faculty of Engineering and Technology, SRM University, Kattankulathur, – 603203 Kancheepuram Dt., Tamil Nadu (India); Ramamurthi, K., E-mail: krmurthin@yahoo.co.in [Crystal Growth and Thin Film Laboratory, Department of Physics and Nanotechnology, Faculty of Engineering and Technology, SRM University, Kattankulathur, – 603203 Kancheepuram Dt., Tamil Nadu (India); Babu, R. Ramesh [Crystal Growth and Thin Film Laboratory, School of Physics, Bharathidasan University, Tiruchirappalli – 620024, Tamil Nadu (India); Sethuraman, K. [School of Physics, Madurai Kamaraj University, Madurai – 625021, Tamil Nadu (India)

    2016-05-01

    Vanadium oxide and fluorine doped vanadium oxide thin films were deposited on the micro-slide glass substrates at 400 °C by spray pyrolysis technique. Vanadium oxide films were deposited using 0.1 M ammonium meta vanadate aqua solution. Precursor solution used to deposit fluorine doped vanadium oxide films was prepared adding separately 5 wt.%, 10 wt.%, 15 wt.% and 20 wt.% of ammonium fluoride with the 0.1 M ammonium meta vanadate aqua solution. X-ray diffraction results showed that the films are in mixed phases of β-V{sub 2}O{sub 5}, V{sub 2}O{sub 5} and V{sub 3}O{sub 7}. Surface morphology and band gap of these films were modified due to different levels of fluorine doping. The average visible transmittance (500–800 nm) of vanadium oxide films is decreased due to low level concentration of fluorine doping. - Highlights: • Addition of a few ml HCl yielded clear precursor aqua solution. • F doped vanadium oxide films were deposited for less concentration of fluorine. • Low level fluorine doping modified the surface morphology of the thin films. • Direct band gap of vanadium oxide film is slightly increased by fluorine doping.

  17. Morphology control of zinc oxide films via polysaccharide-mediated, low temperature, chemical bath deposition

    Directory of Open Access Journals (Sweden)

    Florian Waltz

    2015-03-01

    Full Text Available In this study we present a three-step process for the low-temperature chemical bath deposition of crystalline ZnO films on glass substrates. The process consists of a seeding step followed by two chemical bath deposition steps. In the second step (the first of the two bath deposition steps, a natural polysaccharide, namely hyaluronic acid, is used to manipulate the morphology of the films. Previous experiments revealed a strong influence of this polysaccharide on the formation of zinc oxide crystallites. The present work aims to transfer this gained knowledge to the formation of zinc oxide films. The influence of hyaluronic acid and the time of its addition on the morphology of the resulting ZnO film were investigated. By meticulous adjustment of the parameters in this step, the film morphology can be tailored to provide an optimal growth platform for the third step (a subsequent chemical bath deposition step. In this step, the film is covered by a dense layer of ZnO. This optimized procedure leads to ZnO films with a very high electrical conductivity, opening up interesting possibilities for applications of such films. The films were characterized by means of electron microscopy, X-ray diffraction and measurements of the electrical conductivity.

  18. CdS thin films prepared by laser assisted chemical bath deposition

    Energy Technology Data Exchange (ETDEWEB)

    Garcia, L.V.; Mendivil, M.I.; Garcia Guillen, G.; Aguilar Martinez, J.A. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, Av. Pedro de Alba s/n, Ciudad Universitaria, San Nicolas de los Garza, Nuevo Leon 66450 (Mexico); Krishnan, B. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, Av. Pedro de Alba s/n, Ciudad Universitaria, San Nicolas de los Garza, Nuevo Leon 66450 (Mexico); CIIDIT – Universidad Autonoma de Nuevo Leon, Apodaca, Nuevo Leon (Mexico); Avellaneda, D.; Castillo, G.A.; Das Roy, T.K. [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, Av. Pedro de Alba s/n, Ciudad Universitaria, San Nicolas de los Garza, Nuevo Leon 66450 (Mexico); Shaji, S., E-mail: sshajis@yahoo.com [Facultad de Ingenieria Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, Av. Pedro de Alba s/n, Ciudad Universitaria, San Nicolas de los Garza, Nuevo Leon 66450 (Mexico); CIIDIT – Universidad Autonoma de Nuevo Leon, Apodaca, Nuevo Leon (Mexico)

    2015-05-01

    Highlights: • CdS thin films by conventional CBD and laser assisted CBD. • Characterized these films using XRD, XPS, AFM, optical and electrical measurements. • Accelerated growth was observed in the laser assisted CBD process. • Improved dark conductivity and good photocurrent response for the LACBD CdS. - Abstract: In this work, we report the preparation and characterization of CdS thin films by laser assisted chemical bath deposition (LACBD). CdS thin films were prepared from a chemical bath containing cadmium chloride, triethanolamine, ammonium hydroxide and thiourea under various deposition conditions. The thin films were deposited by in situ irradiation of the bath using a continuous laser of wavelength 532 nm, varying the power density. The thin films obtained during deposition of 10, 20 and 30 min were analyzed. The changes in morphology, structure, composition, optical and electrical properties of the CdS thin films due to in situ irradiation of the bath were analyzed by atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and UV–vis spectroscopy. The thin films obtained by LACBD were nanocrystalline, photoconductive and presented interesting morphologies. The results showed that LACBD is an effective synthesis technique to obtain nanocrystalline CdS thin films having good optoelectronic properties.

  19. Electrophoretic deposition of PTFE particles on porous anodic aluminum oxide film and its tribological properties

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Dongya; Dong, Guangneng, E-mail: donggn@mail.xjtu.edu.cn; Chen, Yinjuan; Zeng, Qunfeng

    2014-01-30

    Polytetrafluoroethylene (PTFE) composite film was successfully fabricated by depositing PTFE particles into porous anodic aluminum oxide film using electrophoretic deposition (EPD) process. Firstly, porous anodic aluminum oxide film was synthesized by anodic oxidation process in sulphuric acid electrolyte. Then, PTFE particles in suspension were directionally deposited into the porous substrate. Finally, a heat treatment at 300 °C for 1 h was utilized to enhance PTFE particles adhesion to the substrate. The influence of anodic oxidation parameters on the morphology and micro-hardness of the porous anodic aluminum oxide film was studied and the PTFE particles deposited into the pores were authenticated using energy-dispersive spectrometer (EDS) and scanning electron microscopy (SEM). Tribological properties of the PTFE composite film were investigated under dry sliding. The experimental results showed that the composite film exhibit remarkable low friction. The composite film had friction coefficient of 0.20 which deposited in 15% PTFE emulsion at temperature of 15 °C and current density of 3 A/dm{sup 2} for 35 min. In addition, a control specimen of porous anodic aluminum oxide film and the PTFE composite film were carried out under the same test condition, friction coefficient of the PTFE composite film was reduced by 60% comparing with the control specimen at 380 MPa and 100 mm/s. The lubricating mechanism was that PTFE particles embedded in porous anodic aluminum oxide film smeared a transfer film on the sliding path and the micro-pores could support the supplement of solid lubricant during the sliding, which prolonged the lubrication life of the aluminum alloys.

  20. Electrophoretic deposition of PTFE particles on porous anodic aluminum oxide film and its tribological properties

    Science.gov (United States)

    Zhang, Dongya; Dong, Guangneng; Chen, Yinjuan; Zeng, Qunfeng

    2014-01-01

    Polytetrafluoroethylene (PTFE) composite film was successfully fabricated by depositing PTFE particles into porous anodic aluminum oxide film using electrophoretic deposition (EPD) process. Firstly, porous anodic aluminum oxide film was synthesized by anodic oxidation process in sulphuric acid electrolyte. Then, PTFE particles in suspension were directionally deposited into the porous substrate. Finally, a heat treatment at 300 °C for 1 h was utilized to enhance PTFE particles adhesion to the substrate. The influence of anodic oxidation parameters on the morphology and micro-hardness of the porous anodic aluminum oxide film was studied and the PTFE particles deposited into the pores were authenticated using energy-dispersive spectrometer (EDS) and scanning electron microscopy (SEM). Tribological properties of the PTFE composite film were investigated under dry sliding. The experimental results showed that the composite film exhibit remarkable low friction. The composite film had friction coefficient of 0.20 which deposited in 15% PTFE emulsion at temperature of 15 °C and current density of 3 A/dm2 for 35 min. In addition, a control specimen of porous anodic aluminum oxide film and the PTFE composite film were carried out under the same test condition, friction coefficient of the PTFE composite film was reduced by 60% comparing with the control specimen at 380 MPa and 100 mm/s. The lubricating mechanism was that PTFE particles embedded in porous anodic aluminum oxide film smeared a transfer film on the sliding path and the micro-pores could support the supplement of solid lubricant during the sliding, which prolonged the lubrication life of the aluminum alloys.

  1. Pulsed laser deposition of AlMgB14 thin films

    Energy Technology Data Exchange (ETDEWEB)

    Britson, Jason Curtis [Iowa State Univ., Ames, IA (United States)

    2008-11-18

    Hard, wear-resistant coatings of thin film borides based on AlMgB14 have the potential to be applied industrially to improve the tool life of cutting tools and pump vanes and may account for several million dollars in savings as a result of reduced wear on these parts. Past work with this material has shown that it can have a hardness of up to 45GPa and be fabricated into thin films with a similar hardness using pulsed laser deposition. These films have already been shown to be promising for industrial applications. Cutting tools coated with AlMgB14 used to mill titanium alloys have been shown to substantially reduce the wear on the cutting tool and extend its cutting life. However, little research into the thin film fabrication process using pulsed laser deposition to make AlMgB14 has been conducted. In this work, research was conducted into methods to optimize the deposition parameters for the AlMgB14 films. Processing methods to eliminate large particles on the surface of the AlMgB14 films, produce films that were at least 1m thick, reduce the surface roughness of the films, and improve the adhesion of the thin films were investigated. Use of a femtosecond laser source rather than a nanosecond laser source was found to be effective in eliminating large particles considered detrimental to wear reduction properties from the films. Films produced with the femtosecond laser were also found to be deposited at a rate 100 times faster than those produced with the nanosecond laser. However, films produced with the femtosecond laser developed a relatively high RMS surface roughness around 55nm. Attempts to decrease the surface roughness were largely unsuccessful. Neither increasing the surface temperature of the substrate during deposition nor using a double pulse to ablate the material was found to be extremely successful to reduce the surface roughness. Finally, the adhesion of the thin films to M2 tool steel

  2. Influences of different oxidants on the characteristics of HfAlOx films deposited by atomic layer deposition

    Institute of Scientific and Technical Information of China (English)

    Fan Ji-Bin; Liu Hong-Xia; Ma Fei; Zhuo Qing-Qing; Hao Yue

    2013-01-01

    A comparative study of two kinds of oxidants (H2O and O3) with the combinations of two metal precursors [trimethylaluminum (TMA) and tetrakis(ethylmethylamino) hafnium (TEMAH)] for atomic layer deposition (ALD) hafnium aluminum oxide (HfAlOx) films is carried out.The effects of different oxidants on the physical properties and electrical characteristics of HfAlOx films are studied.The preliminary testing results indicate that the impurity level of HfAlOx films grown with both H2O and O3 used as oxidants can be well controlled,which has significant effects on the dielectric constant,valence band,electrical properties,and stability of HfAlOx film.Additional thermal annealing effects on the properties of HfAlOx films grown with different oxidants are also investigated.

  3. Effect of incident deposition angle on optical properties and surface roughness of TiO2 thin films

    Science.gov (United States)

    Pan, Yongqiang; Yang, Chen

    2016-10-01

    Optical properties, surface roughness and packing density of TiO2 thin films are studied by obliquely deposited on K9 glass by electron beam evaporation. The surface roughness of TiO2 thin films with different incident deposition angle is compared. The experimental results show that the transmittance increases and transmittance peak shifts to short wavelength with increasing incident deposition angle, the packing density of TiO2 thin films decrease from 0.80 to 0.34 with incident deposition angle increasing from 0° to 75°. The surface roughness of TiO2 thin films increase with increasing incident deposition angle. The surface roughness of TiO2 thin films is slightly bigger than the surface roughness of K9 substrate when the incident deposition angle is 75°. When the incident deposition angle is constant, TiO2 thin films surface roughness decrease with increase of film thickness.

  4. Optical and Electrical Properties Evolution of Diamond-Like Carbon Thin Films with Deposition Temperature

    Institute of Scientific and Technical Information of China (English)

    DING Xu-Li; LI Qing-Shan; KONG Xiang-He

    2009-01-01

    Optical and electrical properties of diamond-like carbon (DLC) films deposited by pulsed laser ablation of graphite target at different substrate temperatures are reported. By varying the deposition temperature from 400 to 25℃, the film optical transparency and electrical resistivity increase severely. Most importantly, the transparency and resistivity properties of the DLC films can be tailored to approaching diamond by adjusting the deposition temperature, which is critical to many applications. DLC films deposited at low temperatures show excellent optical transmittance and high resistivity. Over the same temperature regime an increase of the spa bonded C content is observed using visible Raman spectroscopy, which is responsible for the enhanced transparency and resistivity properties.

  5. Low Temperature Coating of Anatase Thin Films on Silica Glass Fibers by Liquid Phase Deposition

    Institute of Scientific and Technical Information of China (English)

    LI Shun; LIU Jiachen; FENG Tiecheng

    2007-01-01

    Uniform crystalline TiO2 thin films were coated on silica glass fibers by liquid phase deposition from aqueous solution of ammonium hexafluorotitanate at low temperature. TiO2 thin films and nanopowders were prepared by adding H3BO3 into (NH4)2TiF6 solution supersaturated with anatase nano-crystalline TiO2 at 40 ℃. The effects of the deposition conditions on the surface morphology, section morphology, thickness of the deposited TiO2 thin films were investigated. The results indicate that the growth rate and particle size of the thin films were controlled by both the deposition conditions and the amount of anatase nano-crystalline TiO2.

  6. ZnO Thin Films Deposited on Textile Material Substrates for Biomedical Applications

    Science.gov (United States)

    Duta, L.; Popescu, A. C.; Dorcioman, G.; Mihailescu, I. N.; Stan, G. E.; Zgura, I.; Enculescu, I.; Dumitrescu, I.

    We report on the coating with ZnO adherent thin films of cotton woven fabrics by Pulsed laser deposition technique in order to obtain innovative textile materials, presenting protective effects against UV radiations and antifungal action.

  7. PbS Thin Films for Photovoltaic Applications Obtained by Non-Traditional Chemical Bath Deposition

    Directory of Open Access Journals (Sweden)

    Pérez-García Claudia Elena

    2015-01-01

    Full Text Available To optimize cost-efficiency relation for thin film solar cells, we explore the recently developed versions of chemical deposition of semiconductor films, together with classic CBD (Chemical Bath Deposition: SILAR (Successive Ionic Layer Adsorption and Reaction and PCBD (Photo Chemical Bath Deposition, all of them ammonia-free and ecologically friendly. The films of CdS and PbS were made, and experimental solar cells with CdS window layer and PbS absorber elaborated. We found that band gap of PbS films can be monitored by deposition process due to porosity-induced quantum confinement which depends on the parameters of the process. We expect that the techniques employed can be successfully used for production of optoelectronic devices.

  8. Impact of sputter deposition parameters on molybdenum nitride thin film properties

    Science.gov (United States)

    Stöber, L.; Konrath, J. P.; Krivec, S.; Patocka, F.; Schwarz, S.; Bittner, A.; Schneider, M.; Schmid, U.

    2015-07-01

    Molybdenum and molybdenum nitride thin films are presented, which are deposited by reactive dc magnetron sputtering. The influence of deposition parameters, especially the amount of nitrogen during film synthesization, to mechanical and electrical properties is investigated. The crystallographic phase and lattice constants are determined by x-ray diffraction analyses. Further information on the microstructure as well as on the biaxial film stress are gained from techniques such as transmission electron microscopy, scanning electron microscopy and the wafer bow. Furthermore, the film resistivity and the temperature coefficient of resistance are measured by the van der Pauw technique starting from room temperature up to 300 °C. Independent of the investigated physical quantity, a dominant dependence on the sputtering gas nitrogen content is observed compared to other deposition parameters such as the plasma power or the sputtering gas pressure in the deposition chamber.

  9. Photoemission Spectroscopy Characterization of Attempts to Deposit MoO2 Thin Film

    Directory of Open Access Journals (Sweden)

    Irfan

    2011-01-01

    Full Text Available Attempts to deposit molybdenum dioxide (MoO2 thin films have been described. Electronic structure of films, deposited by thermal evaporation of MoO2 powder, had been investigated with ultraviolet photoemission and X-ray photoemission spectroscopy (UPS and XPS. The thermally evaporated films were found to be similar to the thermally evaporated MoO3 films at the early deposition stage. XPS analysis of MoO2 powder reveals presence of +5 and +6 oxidation states in Mo 3d core level along with +4 state. The residue of MoO2 powder indicates substantial reduction in higher oxidation states while keeping +4 oxidation state almost intact. Interface formation between chloroaluminum phthalocyanine (AlPc-Cl and the thermally evaporated film was also investigated.

  10. Transparent ferrimagnetic semiconducting CuCr2O4 thin films by atomic layer deposition

    Science.gov (United States)

    Tripathi, T. S.; Yadav, C. S.; Karppinen, M.

    2016-04-01

    We report the magnetic and optical properties of CuCr2O4 thin films fabricated by atomic layer deposition (ALD) from Cu(thd)2, Cr(acac)3, and ozone; we deposit 200 nm thick films and anneal them at 700 °C in oxygen atmosphere to crystallize the spinel phase. A ferrimagnetic transition at 140 K and a direct bandgap of 1.36 eV are determined for the films from magnetic and UV-vis spectrophotometric measurements. Electrical transport measurements confirm the p-type semiconducting behavior of the films. As the ALD technique allows the deposition of conformal pin-hole-free coatings on complex 3D surfaces, our CuCr2O4 films are interesting material candidates for various frontier applications.

  11. Structural surprises in friction-deposited films of poly(tetrafluoroethylene)

    DEFF Research Database (Denmark)

    Breiby, Dag Werner; Sølling, Theis Ivan; Bunk, Oliver

    2005-01-01

    Thin films of poly(tetrafluoroethylene) (PTFE) produced by friction deposition were studied using grazing incidence X-ray diffraction as the principal tool. The structure of the deposited thin films was compared with that of the surface of the PTFE bar used for depositing the films. Both exhibited...... the 15/7 helix conformation characteristic of crystal PTFE phase IV. A high degree of biaxial orientation was found for the highly crystalline thin films. Whereas the unit cell of the bar surface material appeared to be single-stem hexagonal, the film displayed diffraction characteristics consistent...... with a larger multistem unit cell. The origin of this increase of the unit cell is attributed to a higher degree of regular packing, possibly related to alternating right- and left-handed PTFE helices-a structure which has never been verified experimentally for PTFE in the 15/7 configuration. We discuss...

  12. Chemical solution deposition of CaCu3Ti4O12 thin film

    Indian Academy of Sciences (India)

    Viswanathan S Saji; Han Cheol Choe

    2010-06-01

    CaCu3Ti4O12 (CCTO) thin film was successfully deposited on boron doped silica substrate by chemical solution deposition and rapid thermal processing. The phase and microstructure of the deposited films were studied as a function of sintering temperature, employing X-ray diffractometry and scanning electron microscopy. Dielectric properties of the films were measured at room temperature using impedance spectroscopy. Polycrystalline pure phase CCTO thin films with (220) preferential orientation was obtained at a sintering temperature of 750°C. There was a bimodal size distribution of grains. The dielectric constant and loss factor at 1 kHz obtained for a film sintered at 750°C was ∼ 2000 and tan ∼ 0.05.

  13. Photoelectrochemical activity of liquid phase deposited TiO2 film for degradation of benzotriazole.

    Science.gov (United States)

    Ding, Yaobin; Yang, Changzhu; Zhu, Lihua; Zhang, Jingdong

    2010-03-15

    TiO(2) film deposited on glassy carbon electrode surface was prepared via the liquid phase deposition (LPD). The deposited TiO(2) film before and after calcination was characterized with scanning electron microscopy (SEM) and X-ray diffraction (XRD). Based on the high photoelectrochemical activity of calcined LPD TiO(2) film, the photoelectrocatalytic degradation of benzotriazole (BTA) was investigated. Compared with the electrochemical oxidation process, direct photolysis or photocatalysis for treatment of BTA, a synergetic photoelectrocatalytic degradation effect was observed using the LPD TiO(2) film-coated electrode. Various factors influencing the photoelectrocatalytic degradation of BTA such as film calcination, applied bias potential, pH value, supporting electrolyte concentration and initial concentration of BTA were investigated. The COD removal for BTA solution was analyzed to evaluate the mineralization of the PEC process. Based on the degradation experimental results, a possible photoelectrocatalytic degradation mechanism for BTA was proposed.

  14. Photoelectrochemical activity of liquid phase deposited TiO{sub 2} film for degradation of benzotriazole

    Energy Technology Data Exchange (ETDEWEB)

    Ding Yaobin [College of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Luoyu Road 1037, Wuhan 430074 (China); Yang Changzhu [College of Environmental Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Zhu Lihua [College of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Luoyu Road 1037, Wuhan 430074 (China); Zhang Jingdong, E-mail: zhangjd@mail.hust.edu.cn [College of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Luoyu Road 1037, Wuhan 430074 (China)

    2010-03-15

    TiO{sub 2} film deposited on glassy carbon electrode surface was prepared via the liquid phase deposition (LPD). The deposited TiO{sub 2} film before and after calcination was characterized with scanning electron microscopy (SEM) and X-ray diffraction (XRD). Based on the high photoelectrochemical activity of calcined LPD TiO{sub 2} film, the photoelectrocatalytic degradation of benzotriazole (BTA) was investigated. Compared with the electrochemical oxidation process, direct photolysis or photocatalysis for treatment of BTA, a synergetic photoelectrocatalytic degradation effect was observed using the LPD TiO{sub 2} film-coated electrode. Various factors influencing the photoelectrocatalytic degradation of BTA such as film calcination, applied bias potential, pH value, supporting electrolyte concentration and initial concentration of BTA were investigated. The COD removal for BTA solution was analyzed to evaluate the mineralization of the PEC process. Based on the degradation experimental results, a possible photoelectrocatalytic degradation mechanism for BTA was proposed.

  15. The Effects of Sputtering Target Preparation and Deposition Temperature on ZnTe:Cu Film Properties

    Energy Technology Data Exchange (ETDEWEB)

    Faulkner, Brooke R.; Ohno, T. R.; Burst, James M.; Duenow, Joel N.; Perkins, Craig L.; To, Bobby; Gessert, Timothy A.

    2015-06-14

    A back contact containing a sputtered ZnTe:Cu interface layer can produce high-performing thin-film CdS/CdTe photovoltaic devices. We have found that varying the ZnTe:Cu sputtering target fabrication processes and deposition temperature can affect material properties of the ZnTe:Cu films and the resulting device performance. Two different target 'recipes' with various copper contents were used to study changes in the compositional, structural, optical, and electrical properties of ZnTe:Cu films. Substrate temperature during deposition was also varied to investigate the temperature dependence of the films. It was found that the target recipe, Cu concentration in the target, and deposition temperature affect the composition of the ZnTe:Cu films, which impacts their structural, optical, and electrical properties.

  16. A Humidity Sensor Based on Silver Nanoparticles Thin Film Prepared by Electrostatic Spray Deposition Process

    Directory of Open Access Journals (Sweden)

    Thutiyaporn Thiwawong

    2013-01-01

    Full Text Available In this work, thin film of silver nanoparticles for humidity sensor application was deposited by electrostatic spray deposition technique. The influence of the deposition times on properties of films was studied. The crystal structures of sample films, their surface morphology, and optical properties have been investigated by X-ray diffraction (XRD, field emission scanning electron microscopy (FE-SEM, and UV-VIS spectrophotometer, respectively. The crystalline structure of silver nanoparticles thin film was found in the orientation of (100 and (200 planes of cubic structure at diffraction angles 2θ  =  38.2° and 44.3°, respectively. Moreover, the silver nanoparticles thin films humidity sensor was fabricated onto the interdigitated electrodes. The sensor exhibited the humidity adsorption and desorption properties. The sensing mechanisms of the device were also elucidated by complex impedance analysis.

  17. Deposition Methods and Properties of Polycrystalline CdS Thin Films

    Institute of Scientific and Technical Information of China (English)

    LIANG Qian; ZENG Guanggen; LI Bing; WANG Wenwu; JIANG Haibo; ZHANG Jingquan; LI Wei; WU Lili; FENG Lianghuan

    2015-01-01

    CdS thin film was used as a suitable window layer for CdS/CdTe solar cell, and the properties of CdS thin films deposited by pulsed laser deposition (PLD), chemical bath deposition (CBD) and magnetron sputtering (MS) were reported. The experimental results show that the transmittances of PLD-CdS thin films are about 85%and the band gaps are about 2.38-2.42eV. SEM results show that the surface of PLD-CdS thin film is much more compact and uniform. PLD is more suitable to prepare the CdS thin films than CBD and MS. Based on the thorough study, by using totally PLD technique, the FTO/PLD-CdS(150 nm)/CSS-CdTe solar cell (0.0707 cm2) can be prepared with an efficiency of 10.475%.

  18. Transparent ferrimagnetic semiconducting CuCr2O4 thin films by atomic layer deposition

    Directory of Open Access Journals (Sweden)

    T. S. Tripathi

    2016-04-01

    Full Text Available We report the magnetic and optical properties of CuCr2O4 thin films fabricated by atomic layer deposition (ALD from Cu(thd2, Cr(acac3, and ozone; we deposit 200 nm thick films and anneal them at 700 °C in oxygen atmosphere to crystallize the spinel phase. A ferrimagnetic transition at 140 K and a direct bandgap of 1.36 eV are determined for the films from magnetic and UV-vis spectrophotometric measurements. Electrical transport measurements confirm the p-type semiconducting behavior of the films. As the ALD technique allows the deposition of conformal pin-hole-free coatings on complex 3D surfaces, our CuCr2O4 films are interesting material candidates for various frontier applications.

  19. Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments

    Energy Technology Data Exchange (ETDEWEB)

    Georgieva, V; Bogaerts, A [PLASMANT Research Group, Department of Chemistry, University of Antwerp, Universiteitsplein 1, 2610 Antwerp (Belgium); Saraiva, M; Depla, D [Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Gent (Belgium); Jehanathan, N; Lebelev, O I, E-mail: violeta.georgieva@ua.ac.b [Electron Microscopy for Materials Research (EMAT), University of Antwerp, Groenenborgerlaan 171, B2020 Antwerpen (Belgium)

    2009-03-21

    Using a molecular dynamics model the crystallinity of Mg{sub x}Al{sub y}O{sub z} thin films with a variation in the stoichiometry of the thin film is studied at operating conditions similar to the experimental operating conditions of a dual magnetron sputter deposition system. The films are deposited on a crystalline or amorphous substrate. The Mg metal content in the film ranged from 100% (i.e. MgO film) to 0% (i.e. Al{sub 2}O{sub 3} film). The radial distribution function and density of the films are calculated. The results are compared with x-ray diffraction and transmission electron microscopy analyses of experimentally deposited thin films by the dual magnetron reactive sputtering process. Both simulation and experimental results show that the structure of the Mg-Al-O film varies from crystalline to amorphous when the Mg concentration decreases. It seems that the crystalline Mg-Al-O films have a MgO structure with Al atoms in between.

  20. Superconducting MgB2 Thin Films with Tc ≈ 39 K Grown by Pulsed Laser Deposition

    Institute of Scientific and Technical Information of China (English)

    王淑芳; 戴守愚; 周岳亮; 陈正豪; 崔大复; 许佳迪; 何萌; 吕惠宾; 杨国桢

    2001-01-01

    Superconducting MgB2 thin films were fabricated on Al2 O3 (0001) substrates under ex situ processing conditions.Boron thin films were deposited by pulsed laser deposition followed by a post-annealing process. Resistance measurements of the deposited MgB2 films show Tc of ~39 K, while scanning electron microscopy and x-ray vdiffraction analysis indicate that the films consist of well-crystallized grains with a highly c-axis-oriented structure.

  1. Fabrication and kinetics study of nano-Al/NiO thermite film by electrophoretic deposition.

    Science.gov (United States)

    Zhang, Daixiong; Li, Xueming

    2015-05-21

    Nano-Al/NiO thermites were successfully prepared as film by electrophoretic deposition (EPD). For the key issue of this EPD, a mixture solvent of ethanol-acetylacetone (1:1 in volume) containing 0.00025 M nitric acid was proved to be a suitable dispersion system for EPD. The kinetics of electrophoretic deposition for both nano-Al and nano-NiO were investigated; the linear relation between deposition weight and deposition time in short time and parabolic relation in prolonged time were observed in both EPDs. The critical transition time between linear deposition kinetics and parabolic deposition kinetics for nano-Al and nano-NiO were 20 and 10 min, respectively. The theoretical calculation of the kinetics of electrophoretic deposition revealed that the equivalence ratio of nano-Al/NiO thermites film would be affected by the behavior of electrophoretic deposition for nano-Al and nano-NiO. The equivalence ratio remained steady when the linear deposition kinetics dominated for both nano-Al and nano-NiO. The equivalence ratio would change with deposition time when deposition kinetics for nano-NiO changed into parabolic kinetics dominated after 10 min. Therefore, the rule was suggested to be suitable for other EPD of bicomposites. We also studied thermodynamic properties of electrophoretic nano-Al/NiO thermites film as well as combustion performance.

  2. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

    Science.gov (United States)

    Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko; Puurunen, Riikka L.

    2013-01-01

    Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely suitable for depositing uniform and conformal films on complex three-dimensional topographies. The deposition of a film of a given material by ALD relies on the successive, separated, and self-terminating gas-solid reactions of typically two gaseous reactants. Hundreds of ALD chemistries have been found for depositing a variety of materials during the past decades, mostly for inorganic materials but lately also for organic and inorganic-organic hybrid compounds. One factor that often dictates the properties of ALD films in actual applications is the crystallinity of the grown film: Is the material amorphous or, if it is crystalline, which phase(s) is (are) present. In this thematic review, we first describe the basics of ALD, summarize the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD [R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005)], and give an overview of the status of processing ternary compounds by ALD. We then proceed to analyze the published experimental data for information on the crystallinity and phase of inorganic materials deposited by ALD from different reactants at different temperatures. The data are collected for films in their as-deposited state and tabulated for easy reference. Case studies are presented to illustrate the effect of different process parameters on crystallinity for representative materials: aluminium oxide, zirconium oxide, zinc oxide, titanium nitride, zinc zulfide, and ruthenium. Finally, we discuss the general trends in the development of film crystallinity as function of ALD process parameters. The authors hope that this review will help newcomers to ALD to familiarize themselves with the complex world of crystalline ALD films and, at the same time, serve for the expert as a handbook-type reference source on ALD processes and film crystallinity.

  3. Deposition of diamond like carbon films by using a single ion gun with varying beam source

    Institute of Scientific and Technical Information of China (English)

    JIANG Jin-qiu; Chen Zhu-ping

    2001-01-01

    Diamond like carbon films have been successfully deposited on the steel substrate, by using a single ion gun with varying beam source. The films may appear blue, yellow and transparent in color, which was found related to contaminants from the sample holder and could be avoided. The thickness of the films ranges from tens up to 200 nanometers, and the hardness is in the range 20 to 30 GPa. Raman analytical results reveal the films are in amorphous structure. The effects of different beam source on the films structure are further discussed.

  4. Ion beam analysis of copper selenide thin films prepared by chemical bath deposition

    Science.gov (United States)

    Andrade, E.; García, V. M.; Nair, P. K.; Nair, M. T. S.; Zavala, E. P.; Huerta, L.; Rocha, M. F.

    2000-03-01

    Analyses of Rutherford back scattered (RBS) 4He+-particle spectra of copper selenide thin films deposited on glass slides by chemical bath were carried out to determine the changes brought about in the thin film by annealing processes. The atomic density per unit area and composition of the films were obtained from these measurements. This analysis shows that annealing in a nitrogen atmosphere at 400°C leads to the conversion of Cu xSe thin film to Cu 2Se. Results of X-ray diffraction, optical, and electrical characteristics on the films are presented to supplement the RBS results.

  5. Electronic and optical studies of pulse laser deposited ZnO/NiO bilayer film

    Science.gov (United States)

    Baraskar, P.; Dar, T. A.; Choudhary, R. J.; Sen, P. K.; Sen, P.

    2016-10-01

    We report the structural, optical and electronic properties of polycrystalline ZnO and NiO thin films and amorphous ZnO/NiO bilayer film, prepared by pulsed laser deposition technique. Despite of the presence of both Zn and Ni in +2 state in the bilayer film, the grown bilayer shows no reflections (in XRD) corresponding to ZnO or NiO. The difference in crystal structure of ZnO and NiO leads to the strain in the grown bilayer film. An increase in the band gap has been observed in bilayer film which can be attributed to the amorphous nature of the structure.

  6. Preparation of high-pressure phase boron nitride films by physical vapor deposition

    CERN Document Server

    Zhu, P W; Zhao, Y N; Li, D M; Liu, H W; Zou Guang Tian

    2002-01-01

    The high-pressure phases boron nitride films together with cubic, wurtzic, and explosive high-pressure phases, were successfully deposited on the metal alloy substrates by tuned substrate radio frequency magnetron sputtering. The percentage of cubic boron nitride phase in the film was about 50% as calculated by Fourier transform infrared measurements. Infrared peak position of cubic boron nitride at 1006.3 cm sup - sup 1 , which is close to the stressless state, indicates that the film has very low internal stress. Transition electron microscope micrograph shows that pure cubic boron nitride phase exits on the surface of the film. The growth mechanism of the BN films was also discussed.

  7. Pulsed Laser Deposition of BaTiO3 Thin Films on Different Substrates

    Directory of Open Access Journals (Sweden)

    Yaodong Yang

    2010-01-01

    Full Text Available We have studied the deposition of BaTiO3 (BTO thin films on various substrates. Three representative substrates were selected from different types of material systems: (i SrTiO3 single crystals as a typical oxide, (ii Si wafers as a semiconductor, and (iii Ni foils as a magnetostrictive metal. We have compared the ferroelectric properties of BTO thin films obtained by pulsed laser deposition on these diverse substrates.

  8. Kinetic Monte Carlo simulation of physical vapor deposition of thin Cu film

    Institute of Scientific and Technical Information of China (English)

    WANG Jun; CHEN Chang-qi; ZHU Wu

    2004-01-01

    A two-dimensional Kinetic Monte Carlo method has been developed for simulating the physical vapor deposition of thin Cu films on Cu substrate. An improved embedded atom method was used to calculate the interatomic potential and determine the diffusion barrier energy and residence time. Parameters, including incident angle,deposition rate and substrate temperature, were investigated and discussed in order to find their influences on the thin film morphology.

  9. Low temperature plasma deposition of silicon thin films: From amorphous to crystalline

    OpenAIRE

    Roca i Cabarrocas, Pere; Cariou, Romain; Labrune, Martin

    2012-01-01

    International audience; We report on the epitaxial growth of crystalline silicon films on (100) oriented crystalline silicon substrates by standard plasma enhanced chemical vapor deposition at 175 °C. Such unexpected epitaxial growth is discussed in the context of deposition processes of silicon thin films, based on silicon radicals and nanocrystals. Our results are supported by previous studies on plasma synthesis of silicon nanocrystals and point toward silicon nanocrystals being the most p...

  10. Porous nanostructured ZnO films deposited by picosecond laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Sima, Cornelia [University of Bucharest, Faculty of Physics, 405 Atomistilor, P.O. Box MG-11, 077125, Bucharest-Magurele (Romania); National Institute for Laser, Plasma and Radiation Physics, Laser Department, 409 Atomistilor, P.O. Box MG-36, 077125, Bucharest-Magurele (Romania); Grigoriu, Constantin, E-mail: grigoriu@ifin.nipne.ro [National Institute for Laser, Plasma and Radiation Physics, Laser Department, 409 Atomistilor, P.O. Box MG-36, 077125, Bucharest-Magurele (Romania); Besleaga, Cristina; Mitran, Tudor; Ion, Lucian; Antohe, Stefan [University of Bucharest, Faculty of Physics, 405 Atomistilor, P.O. Box MG-11, 077125, Bucharest-Magurele (Romania)

    2012-08-20

    Highlights: Black-Right-Pointing-Pointer We deposite porous nanostructured ZnO films by picoseconds laser ablation (PLA). Black-Right-Pointing-Pointer We examine changes of the films structure on the experimental parameter deposition. Black-Right-Pointing-Pointer We demonstrate PLA capability to produce ZnO nanostructured films free of particulates. - Abstract: Porous nanostructured polycrystalline ZnO films, free of large particulates, were deposited by picosecond laser ablation. Using a Zn target, zinc oxide films were deposited on indium tin oxide (ITO) substrates using a picosecond Nd:YVO{sub 4} laser (8 ps, 50 kHz, 532 nm, 0.17 J/cm{sup 2}) in an oxygen atmosphere at room temperature (RT). The morpho-structural characteristics of ZnO films deposited at different oxygen pressures (150-900 mTorr) and gas flow rates (0.25 and 10 sccm) were studied. The post-deposition influence of annealing (250-550 Degree-Sign C) in oxygen on the film characteristics was also investigated. At RT, a mixture of Zn and ZnO formed. At substrate temperatures above 350 Degree-Sign C, the films were completely oxidized, containing a ZnO wurtzite phase with crystallite sizes of 12.2-40.1 nm. At pressures of up to 450 mTorr, the porous films consisted of well-distinguished primary nanoparticles with average sizes of 45-58 nm, while at higher pressures, larger clusters (3.1-14.7 {mu}m) were dominant, leading to thicker films; higher flow rates favored clustering.

  11. Influence of deposition temperature of thermal ALD deposited Al2O3 films on silicon surface passivation

    Science.gov (United States)

    Batra, Neha; Gope, Jhuma; Vandana, Panigrahi, Jagannath; Singh, Rajbir; Singh, P. K.

    2015-06-01

    The effect of deposition temperature (Tdep) and subsequent annealing time (tanl) of atomic layer deposited aluminum oxide (Al2O3) films on silicon surface passivation (in terms of surface recombination velocity, SRV) is investigated. The pristine samples (as-deposited) show presence of positive fixed charges, QF. The interface defect density (Dit) decreases with increase in Tdep which further decreases with tanl up to 100s. An effective surface passivation (SRV<8 cm/s) is realized for Tdep ≥ 200 °C. The present investigation suggests that low thermal budget processing provides the same quality of passivation as realized by high thermal budget process (tanl between 10 to 30 min).

  12. High-rate deposition of nano-crystalline silicon thin films on plastics

    Energy Technology Data Exchange (ETDEWEB)

    Marins, E.; Guduru, V.; Cerqueira, F.; Alpuim, P. [Centro de Fisica, Universidade do Minho, 4800-058 Guimaraes, 4710-057 Braga (Portugal); Ribeiro, M. [Centro de Nanotecnologia e Materiais Tecnicos, Funcionais e Inteligentes (CeNTI), 4760-034 Vila Nova de Famalicao (Portugal); Bouattour, A. [Institut fuer Physikalische Elektronik (ipe), Universitaet Stuttgart, 70569 Stuttgart (Germany)

    2011-03-15

    Nanocrystalline silicon (nc-Si:H) is commonly used in the bottom cell of tandem solar cells. With an indirect bandgap, nc-Si:H requires thicker ({proportional_to}1 {mu}m) films for efficient light harvesting than amorphous Si (a-Si:H) does. Therefore, thin-film high deposition rates are crucial for further cost reduction of highly efficient a-Si:H based photovoltaic technology. Plastic substrates allow for further cost reduction by enabling roll-to-roll inline deposition. In this work, high nc-Si:H deposition rates on plastic were achieved at low substrate temperature (150 C) by standard Radio-frequency (13.56 MHz) Plasma Enhanced Chemical Vapor Deposition. Focus was on the influence of deposition pressure, inter-electrode distance (1.2 cm) and high power coupled to the plasma, on the hydrogen-to-silane dilution ratios (HD) necessary to achieve the amorphous-to-nanocrystalline phase transition and on the resulting film deposition rate. For each pressure and rf-power, there is a value of HD for which the films start to exhibit a certain amount of crystalline fraction. For constant rf-power, this value increases with pressure. Within the parameter range studied the deposition rate was highest (0.38 nm/s) for nc-Si:H films deposited at 6 Torr, 700 mW/cm{sup 2} using HD of 98.5%. Decreasing the pressure to 3 Torr (1.5 Torr) and rf-power to 350 mW/cm{sup 2} using HD - 98.5% deposition rate is 0.12 nm/s (0.076 nm/s). Raman crystalline fraction of these films is 72, 62 and 53% for the 6, 3 and 1.5 Torr films, respectively (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  13. Optical properties and structures of silver thin films deposited by magnetron sputtering with different thicknesses

    Institute of Scientific and Technical Information of China (English)

    Xilian Sun; Ruijin Hong; Haihong Hou; Zhengxiu Fan; Jianda Shao

    2006-01-01

    A series of thin Ag films with different thicknesses grown under identical conditions are analyzed by means of spectrophotometer. From these measurements the values of refractive index and extinction coefficient are calculated. The films are deposited onto BK7 glass substrates by direct current (DC) magnetron sputtering. It is found that the optical properties of the Ag films can be affected by films thickness.Below critical thickness of 17 nm, which is the thickness at which Ag films form continuous films, the optical properties and constants vary significantly with thickness increasing and then tend to a stable value up to about 40 nm. At the same time, X-ray diffraction measurement is carried out to examine the microstructure evolution of Ag films as a function of films thickness. The relation between optical properties and microstructure is discussed.

  14. Characterization of sputter-deposited TiPdNi thin films

    Institute of Scientific and Technical Information of China (English)

    田青超; 吴建生

    2002-01-01

    TiPdNi thin films were prepared by magne tron sputtering onto unheated glass and silicon substrate. Atomic force microscope, energy-dispersive X-ray mi croanalyzer, X-ray diffractometer, differential scanning calorimeter and optical microscope were used to characterize the films. It is found that the surface m orphology of the films change during the sputtering process and a shift of about 3%Ti(mole fraction) content from the center to the edge of the substrate occurs. The freestanding as-deposited films undergo crystallization followed by three kinds of cooling conditions. For all these heat-treated films, B2→B19→B19′ two- stage phase transformation takes place. Many Ti2Ni and Ti2Pd type of precipitates are detected in the films. The constraint films on silicon substrate are crystallized at high temperature. After crystallization, the films show a two-way shape memory effect.

  15. ZnO films deposited by optimized PLD technique with bias voltages

    Energy Technology Data Exchange (ETDEWEB)

    Yamaguchi, Hiroyuki; Shitara, Tamae; Komiyama, Takao; Chonan, Yasunori; Aoyama, Takashi [Department of Electronics and Information Systems, Akita Prefectural University, 84-4 Tsuchiya Ebinokuchi, 015-0055 Yuri-Honjo (Japan)

    2010-02-15

    The pulsed laser deposition (PLD) technique with bias voltage application for formation of high quality ZnO films was investigated. Oxygen ambient in the PLD chamber significantly decreased the photoluminescence (PL) intensity of near band edge (NBE) emission. Then, instead of using oxygen ambient, the PLD technique with bias voltage application was optimized to attain the stoichiometric composition of the ZnO films. As the deposition temperature was increased, the X-ray spectrum width diffracted from the (0002) planes was decreased and it showed a minimum value at 700 C. The PL intensity of the NBE emission also had its maximum value for the film deposited at 700 C. For the ZnO films deposited at 700 C, the X-ray spectrum width showed the minimum value under a bias voltage of -50 V. The PL intensity of the NBE emission also had a maximum value under the same bias voltage. Thus, ZnO films deposited under a bias voltage of -50 V at 700 C had strong NBE emission intensities. These results could be explained not only by attaining the stoichiometric composition of the ZnO film but also by decreasing the number of high energy O{sup 2-} ions which caused non-radiative recombination centers in the film. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  16. High sensitive formaldehyde graphene gas sensor modified by atomic layer deposition zinc oxide films

    Energy Technology Data Exchange (ETDEWEB)

    Mu, Haichuan; Zhang, Zhiqiang; Wang, Keke; Xie, Haifen, E-mail: hfxie@ecust.edu.cn [Department of Physics, School of Science, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237 (China); Zhao, Xiaojing; Liu, Feng [Department of Physics, Shanghai Normal University, 100 Guilin Road, Shanghai 200234 (China)

    2014-07-21

    Zinc oxide (ZnO) thin films with various thicknesses were fabricated by Atomic Layer Deposition on Chemical Vapor Deposition grown graphene films and their response to formaldehyde has been investigated. It was found that 0.5 nm ZnO films modified graphene sensors showed high response to formaldehyde with the resistance change up to 52% at the concentration of 9 parts-per-million (ppm) at room temperature. Meanwhile, the detection limit could reach 180 parts-per-billion (ppb) and fast response of 36 s was also obtained. The high sensitivity could be attributed to the combining effect from the highly reactive, top mounted ZnO thin films, and high conductive graphene base network. The dependence of ZnO films surface morphology and its sensitivity on the ZnO films thickness was also investigated.

  17. Enhanced antireflection properties of silica thin films via redox deposition and hot-water treatment

    Energy Technology Data Exchange (ETDEWEB)

    Chigane, Masaya; Hatanaka, Yoshiro; Shinagawa, Tsutomu [Department of Electronic Materials, Osaka Municipal Technical Research Institute, 1-6-50 Morinomiya, Joto-ku, Osaka 536-8553 (Japan)

    2010-06-15

    Silicon oxide (SiO{sub x}) thin film was deposited onto poly(ethylene terephthalate) substrate by the reduction of an aqueous solution containing ammonium hexafluorosilicate, dimethylamine borane and cetyltrimethylammonium bromide (CTAB). Post-deposition hot water treatment: immersion of the film in water at 333 K dissolved CTAB producing nanopores in silica (SiO{sub 2}) film and remarkably enhanced the antireflection property of the film: 0.1% at 550 nm of wavelength. The films before and after the treatment were compared via characterization by means of X-ray photoelectron spectroscopic depth profile, X-ray diffraction and transmission electron microscopy. The decrease of refractive index dispersion by the porous silica films, attributing to the low reflection, was verified by effective medium approximation analysis. (author)

  18. Robust Mechanical Properties of Electrically Insulative Alumina Films by Supersonic Aerosol Deposition

    Science.gov (United States)

    Lee, Jong-Gun; Cha, You-Hong; Kim, Do-Yeon; Lee, Jong-Hyuk; Lee, Tae-Kyu; Kim, Woo-Young; Park, Jieun; Lee, Dongyun; James, Scott C.; Al-Deyab, Salem S.; Yoon, Sam S.

    2015-08-01

    Electrically insulating alumina films were fabricated on steel substrates using supersonic aerosol deposition and their hardness and scratchability were measured. Alumina particles (0.4-μm diameter) were supersonically sprayed inside a low-pressure chamber using between 1 and 20 nozzle passes. These alumina particles were annealed between 300 and 800 K to determine the temperature's effect on film crystal size (37-41 nm). Smoother surface morphology and increased electrical resistance of the thin films were observed as their thicknesses grew by increasing the number of passes. Resistances of up to 10,000 MΩ demonstrate robust electrical insulation. Significant hardness was measured (1232 hv or 13.33 GPa), but the alumina films could be peeled off with normal loads of 36 and 47 N for films deposited on stainless steel and SKD11 substrates, respectively. High insulation and hardness confirm that these alumina films would make excellent electrical insulators.

  19. Chemically deposited Sb{sub 2}S{sub 3} thin films for optical recording

    Energy Technology Data Exchange (ETDEWEB)

    Shaji, S; Arato, A; Castillo, G Alan; Palma, M I Mendivil; Roy, T K Das; Krishnan, B [Facultad de IngenierIa Mecanica y Electrica, Universidad Autonoma de Nuevo Leon, San Nicolas de los Garza, Nuevo Leon, C.P- 66450 (Mexico); O' Brien, J J; Liu, J, E-mail: bkrishnan@fime.uanl.m [Center for Nanoscience and Department of Chemistry and Biochemistry, University of Missouri-St. Louis, One Univ. Blvd., St. Louis, MO - 63121 (United States)

    2010-02-24

    Laser induced changes in the properties of Sb{sub 2}S{sub 3} thin films prepared by chemical bath deposition are described in this paper. Sb{sub 2}S{sub 3} thin films of thickness 550 nm were deposited from a solution containing SbCl{sub 3} and Na{sub 2}S{sub 2}O{sub 3} at 27 {sup 0}C for 5 h. These thin films were irradiated by a 532 nm continuous wave laser beam under different conditions at ambient atmosphere. X-ray diffraction analysis showed amorphous to polycrystalline transformation due to laser exposure of these thin films. Morphology and composition of these films were described. Optical properties of these films before and after laser irradiation were analysed. The optical band gap of the material was decreased due to laser induced crystallization. The results obtained confirm that there is further scope for developing this material as an optical recording media.

  20. Studies on the properties of sputter-deposited Al-doped ZnO films

    Science.gov (United States)

    Selmi, M.; Chaabouni, F.; Abaab, M.; Rezig, B.

    2008-09-01

    ZnO is a well known material; however, the research interest in this material is still high enough because ZnO is one of the materials with the most potential for optoelectronics due to its promising properties of high conductivity as well as good transparency. In this work, aluminum doped zinc oxide films (ZnO:Al) were deposited by RF magnetron sputtering on glass and silicon substrates with different deposition times of 2, 3 and 4 h. The aim of this work is the study of the deposition time effect on the properties of ZnO:Al films. It is shown that films grow with the hexagonal c-axis perpendicular to the substrate surface. The morphological characteristics show a granular and homogenous surface and the cristallinity of the films is enhanced with increased deposition time. The deposited films show good optical transmittance (80%-90%) in the visible and near infrared spectrum. The calculated band gap is about 3.3 eV. The electrical ZnO:Al/Si(p) junction properties were investigated using the Capacitance-Voltage ( C-V) dependence. Calculations of the built-in potential from classical 1/C2-V characterization give values between 0.54 and 0.71 V. This work shows how the variation of deposition time allows the control of structural, electrical and optical properties of the films.

  1. Atomic layer deposition of copper and copper silver films using an electrochemical process

    Energy Technology Data Exchange (ETDEWEB)

    Fang, J.S., E-mail: jsfang@nfu.edu.tw [Department of Materials Science and Engineering, National Formosa University, Huwei 63201, Taiwan (China); Liu, Y.S. [Department of Materials Science and Engineering, National Formosa University, Huwei 63201, Taiwan (China); Chin, T.S. [Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan (China)

    2015-04-01

    This paper describes the formation and properties of Cu and Cu(Ag) films on a Ru/Si substrate using electrochemical atomic layer deposition. The process was performed layer-by-layer using underpotential deposition (UPD) and surface-limited redox reactions. The first Cu atomic layer was deposited on the Ru/Si substrate via UPD. Using UPD, atomic layered of Pb, which acts as a sacrificial layer, was applied on the Cu layer. Then, a Cu{sup 2+} solution was flushed into the cell at an open-circuit potential, and the Pb layer was exchanged for Cu via redox replacements. The above sequences were repeated 500 times to form a Cu film. The Cu(Ag) alloy films were formed using Cu–UPD and Ag–UPD in predetermined sequences. The lowest electrical resistivity achieved was 3.6 and 2.2 μΩ cm for the Cu film and Cu(Ag) film, respectively, after annealing at 400 °C. Due to the self-limiting reactions, the process has the ability to deposit atomic layers to meet the requirement of Cu interconnects. - Highlights: • Layer-by-layer growth of Cu and Cu(Ag) films are prepared using electrochemical atomic layer deposition. • Cu coverage is from 0.33 to 0.51 ML for each deposition cycle in different NaCl concentrations. • The process can be applied in Cu interconnections.

  2. A Cationic Diode Based on Asymmetric Nafion® Film Deposits

    NARCIS (Netherlands)

    He, Daping; Madrid, Elena; Aaronson, Barak; Fan, Lian; Doughty, James; Mathwig, Klaus; Bond, Alan M; McKeown, Neil B; Marken, Frank

    2017-01-01

    A thin film of Nafion®, of approximately 5 microm thickness, asymmetrically deposited onto a 6 microm thick film of poly(ethylene terephthalate) (PET) fabricated with a 5, 10, 20, or 40 microm microhole, is shown to exhibit prominent ionic diode behaviour involving cation charge carrier ("cationic d

  3. Surface modification by plasma polymerization: film deposition, tailoring of surface properties and biocompatibility

    NARCIS (Netherlands)

    Os, van Menno Thomas

    2000-01-01

    The work described in this thesis concerns the surface modification of materials by thin film deposition in a plasma reactor. In particular, thin polymeric films bearing amine functionalities were synthesized by plasma polymerization of amino group containing monomers. In addition to the synthesis,

  4. Surface treatment of polyimide film for metal magnetron deposition in vacuum

    Science.gov (United States)

    Petrov, V.; Vertyanov, D.; Timoshenkov, S.; Nikolaev, V.

    2014-12-01

    This paper brings forward a solution for acquisition of good quality metallization layers on the polyimide substrate by magnetron deposition in vacuum environment. Different film type structures have been analyzed after refining and activation surface treatment operations. Positive effect was shown after the application of polyimide lacquer for surface dielectric film planarization and for structural defects elimination.

  5. Optical properties of multilayer bimetallic films obtained by laser deposition of colloidal particles

    Science.gov (United States)

    Antipov, A.; Arakelian, S.; Vartanyan, T.; Gerke, M.; Istratov, A.; Kutrovskaya, S.; Kucherik, A.; Osipov, A.

    2016-11-01

    The optical properties of multilayer bimetallic films composed of silver and gold nanoparticles have been investigated. The dependence of the transmission spectra of the films on their morphology is demonstrated. A finite-difference time-domain (FDTD) simulation has confirmed that there is a dependence of the transmission spectra on the average distance between particles and the number of deposited layers.

  6. Deposition and characterization of La 2Ti 2O 7 thin films via spray pyrolysis process

    Science.gov (United States)

    Todorovsky, D. S.; Todorovska, R. V.; Milanova, M. M.; Kovacheva, D. G.

    2007-03-01

    Thin films of La 2Ti 2O 7 have been deposited on fused silica and Si substrates by a spray pyrolysis method using ethylene glycol solution of La(III)-Ti(IV)-citrate complexes as starting material and O 2 as a carrier gas. The composition, crystal structure and morphology of the films are studied.

  7. Optical properties of PMN-PT thin films prepared using pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Tong, X.L., E-mail: tongxinglin@yahoo.com.cn [Key Laboratory of Fiber Optic Sensing Technology and Information Processing, Wuhan University of Technology, Ministry of Education, 122 Luoshi Road, Wuhan 430070 (China); Lin, K.; Lv, D.J.; Yang, M.H.; Liu, Z.X.; Zhang, D.S. [Key Laboratory of Fiber Optic Sensing Technology and Information Processing, Wuhan University of Technology, Ministry of Education, 122 Luoshi Road, Wuhan 430070 (China)

    2009-06-30

    (1 - x)Pb(Mg{sub 1/3}Nb{sub 2/3})O{sub 3}-xPbTiO{sub 3} (PMN-PT) thin films have been deposited on quartz substrates using pulsed laser deposition (PLD). Crystalline microstructure of the deposited PMN-PT thin films has been investigated with X-ray diffraction (XRD). Optical transmission spectroscopy and Raman spectroscopy are used to characterize optical properties of the deposited PMN-PT thin films. The results show that the PMN-PT thin films of perovskite structure have been formed, and the crystalline and optical properties of the PMN-PT thin films can be improved as increasing the annealing temperature to 750 deg. C, but further increasing the annealing temperature to 950 deg. C may lead to a degradation of the crystallinity and the optical properties of the PMN-PT thin films. In addition, a weak second harmonic intensity (SHG) has been observed for the PMN-PT thin film formed at the optimum annealing temperature of 750 deg. C according to Maker fringe method. All these suggest that the annealing temperature has significant effect on the structural and optical properties of the PMN-PT thin films.

  8. Microstructure and tribological performance of diamond-like carbon films deposited on hydrogenated rubber

    NARCIS (Netherlands)

    Pal, J.P. van der; Martinez Martinez, Diego; Pei, Y.T.; Rudolf, P.; Hosson, J.Th.M. De

    2012-01-01

    In this paper, the microstructure and tribological performance of diamond-like carbon (DLC) films prepared by plasma chemical vapor deposition on hydrogenated nitrile butadiene rubbers (HNBR) are studied. Different negative variations of temperature during film growth were selected by proper changes

  9. Development of plasma assisted thermal vapor deposition technique for high-quality thin film

    Science.gov (United States)

    Lee, Kang-Il; Choi, Yong Sup; Park, Hyun Jae

    2016-12-01

    The novel technique of Plasma-Assisted Vapor Deposition (PAVD) is developed as a new deposition method for thin metal films. The PAVD technique yields a high-quality thin film without any heating of the substrate because evaporated particles acquire energy from plasma that is confined to the inside of the evaporation source. Experiments of silver thin film deposition have been carried out in conditions of pressure lower than 10-3 Pa. Pure silver plasma generation is verified by the measurement of the Ag-I peak using optical emission spectroscopy. A four point probe and a UV-VIS spectrophotometer are used to measure the electrical and optical properties of the silver film that is deposited by PAVD. For an ultra-thin silver film with a thickness of 6.5 nm, we obtain the result of high-performance silver film properties, including a sheet resistance 75%. The PAVD-film properties show a low sheet resistance of 30% and the same transmittance with conventional thermal evaporation film. In the PAVD source, highly energetic particles and UV from plasma do not reach the substrate because the plasma is completely shielded by the optimized nozzle of the crucible. This new PAVD technique could be a realistic solution to improve the qualities of transparent electrodes for organic light emission device fabrication without causing damage to the organic layers.

  10. A direct solution deposition approach to CdTe thin films

    Energy Technology Data Exchange (ETDEWEB)

    Miskin, Caleb K.; Dubois-Camacho, Angela; Reese, Matthew O.; Agrawal, Rakesh

    2016-01-01

    A direct solution deposition approach to CdTe thin films is presented. The difficulty of co-dissolving Te and desirable Cd salts is overcome through a diamine-thiol solvent mixture. Thin films of densely-packed, micron-sized grains are achieved after annealing without the need for chalcogen or CdCl2 vapor treatments.

  11. Vaporization of a mixed precursors in chemical vapor deposition for YBCO films

    Science.gov (United States)

    Zhou, Gang; Meng, Guangyao; Schneider, Roger L.; Sarma, Bimal K.; Levy, Moises

    1995-01-01

    Single phase YBa2Cu3O7-delta thin films with T(c) values around 90 K are readily obtained by using a single source chemical vapor deposition technique with a normal precursor mass transport. The quality of the films is controlled by adjusting the carrier gas flow rate and the precursor feed rate.

  12. Cracking and delamination of metal organic vapour deposited alumina and silica films

    NARCIS (Netherlands)

    Haanappel, V.A.C.; Haanappel, V.A.C.; van Corbach, H.D.; Fransen, T.; Gellings, P.J.

    1993-01-01

    Amorphous alumina and silica films were deposited on AISI by thermal decomposition at atmospheric pressure of aluminium-tri-sec-butoxide and di-acetoxy-di-tertiary-butoxided-silane respectively. Above a critical coating thickness of the oxide films, cracking and delamination occurred during the

  13. Thermo-Mechanical Properties of Alumina Films Created Using the Atomic Layer Deposition Technique

    Science.gov (United States)

    2010-01-01

    23 (9) (2008) 2443–2457. [32] G.G. Stoney, The tension ofmetallic films deposited by electrolysis , Proc. R. Soc. A82 (553) (1909) 172–175. [33] M...Springer-Verlag, New York, 2006. [37] R.M. Keller, S.P. Baker, E. Arzt, Stress–temperature behavior of unpassivated thin copper films, Acta Mater. 47 (2

  14. Advances in studies of the tribological behavior of molecular deposition films

    Institute of Scientific and Technical Information of China (English)

    Xiao Yuqi; Zhang Siwei; Wang Deguo; Gao Manglai

    2008-01-01

    An overview of the advances in studies on tribology of molecular deposition (MD) films is presented here to summarize the studies of nanofrictional properties, adhesion, wear and mechanical behavior, as well as the molecular dynamics simulation of nanotribological properties of the film in the last decade. Some key research topics which need to be investigate further are addressed.

  15. D. C. electrical properties of vacuum-deposited CdTe films

    Energy Technology Data Exchange (ETDEWEB)

    Gogoi, S.; Barua, K.

    1982-06-18

    The current-voltage characteristics of vacuum-deposited CdTe films were studied as a function of film thickness (2500-13 000 A) at various temperatures (0-110/sup 0/C). The d.c. conduction mechanism was explained using a modified Poole-Frenkel equation.

  16. Epitaxial growth of atomically flat gadolinia-doped ceria thin films by pulsed laser deposition

    DEFF Research Database (Denmark)

    Chen, Yunzhong; Pryds, Nini; Schou, Jørgen;

    2011-01-01

    Epitaxial growth of Ce0.8Gd0.2O2(CGO) films on (001) TiO2-terminated SrTiO3 substrates by pulsed laser deposition was investigated using in situ reflective high energy electron diffraction. The initial film growth shows a Stransky–Krastanov growth mode. However, this three-dimensional island...

  17. Growth process conditions of tungsten oxide thin films using hot-wire chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Houweling, Z. Silvester, E-mail: Z.S.Houweling@uu.nl [Nanophotonics - Physics of Devices, Debye Institute for Nanomaterials Science, Utrecht University, Princetonlaan 4, 3584 CB Utrecht (Netherlands); Geus, John W. [Electron Microscopy, Utrecht University, Padualaan 8, 3584 CH Utrecht (Netherlands); Jong, Michiel de; Harks, Peter-Paul R.M.L.; Werf, Karine H.M. van der; Schropp, Ruud E.I. [Nanophotonics - Physics of Devices, Debye Institute for Nanomaterials Science, Utrecht University, Princetonlaan 4, 3584 CB Utrecht (Netherlands)

    2011-12-15

    Highlights: Black-Right-Pointing-Pointer Process parameters to control hot-wire CVD of WO{sub 3-x} are categorized. Black-Right-Pointing-Pointer Growth time, oxygen partial pressure, filament and substrate temperature are varied. Black-Right-Pointing-Pointer Chemical and crystal structure, optical bandgap and morphology are determined. Black-Right-Pointing-Pointer Oxygen partial pressure determines the deposition rate up to as high as 36 {mu}m min{sup -1}. Black-Right-Pointing-Pointer Nanostructures, viz. wires, crystallites and closed crystallite films, are controllably deposited. - Abstract: We report the growth conditions of nanostructured tungsten oxide (WO{sub 3-x}) thin films using hot-wire chemical vapor deposition (HWCVD). Two tungsten filaments were resistively heated to various temperatures and exposed to an air flow at various subatmospheric pressures. The oxygen partial pressure was varied from 6.0 Multiplication-Sign 10{sup -6} to 1.0 mbar and the current through the filaments was varied from 4.0 to 9.0 A, which constitutes a filament temperature of 1390-2340 Degree-Sign C in vacuum. It is observed that the deposition rate of the films is predominantly determined by the oxygen partial pressure; it changes from about 1 to about 36,000 nm min{sup -1} in the investigated range. Regardless of the oxygen partial pressure and filament temperature used, thin films with a nanogranular morphology are obtained, provided that the depositions last for 30 min or shorter. The films consist either of amorphous or partially crystallized WO{sub 3-x} with high averaged transparencies of over 70% and an indirect optical band gap of 3.3 {+-} 0.1 eV. A prolonged deposition time entails an extended exposure of the films to thermal radiation from the filaments, which causes crystallization to monoclinic WO{sub 3} with diffraction maxima due to the (0 0 2), (2 0 0) and (0 2 0) crystallographic planes, furthermore the nanograins sinter and the films exhibit a cone

  18. Large-Area Nanoparticle Films by Continuous Automated Langmuir-Blodgett Assembly and Deposition.

    Science.gov (United States)

    Li, Xue; Gilchrist, James F

    2016-02-09

    The operating parameters and resulting surface morphology of automated Langmuir-Blodgett deposition of monosized micrometer-scale silica colloids from an aqueous suspension are investigated. This apparatus allows continuous roll-to-roll deposition of particles into well-ordered arrays. The reproducible deposition of particle monolayers at low to moderate deposition rates at web speeds of less than 10 mm/s is possible and accurately characterized by a simple mass balance of particles deposited from solution. At faster deposition rates, Landau-Levich flow increases the film thickness such that flow instabilities hinder uniform particle deposition. A simple phase diagram outlines transitions from dispersed to multilayer coatings and from uniform to erratic deposition patterns. While the threshold of maximum deposition rate is well-defined for these conditions, changing operating parameters, particle size, and fluid viscosity and evaporation rate, the maximum speed can be increased significantly.

  19. Optical and mechanical properties of diamond like carbon films deposited by microwave ECR plasma CVD

    Indian Academy of Sciences (India)

    S B Singh; M Pandey; N Chand; A Biswas; D Bhattacharya; S Dash; A K Tyagi; R M Dey; S K Kulkarni; D S Patil

    2008-10-01

    Diamond like carbon (DLC) films were deposited on Si (111) substrates by microwave electron cyclotron resonance (ECR) plasma chemical vapour deposition (CVD) process using plasma of argon and methane gases. During deposition, a d.c. self-bias was applied to the substrates by application of 13.56 MHz rf power. DLC films deposited at three different bias voltages (–60 V, –100 V and –150 V) were characterized by FTIR, Raman spectroscopy and spectroscopic ellipsometry to study the variation in the bonding and optical properties of the deposited coatings with process parameters. The mechanical properties such as hardness and elastic modulus were measured by load depth sensing indentation technique. The DLC film deposited at –100 V bias exhibit high hardness (∼ 19 GPa), high elastic modulus (∼ 160 GPa) and high refractive index (∼ 2.16–2.26) as compared to films deposited at –60 V and –150 V substrate bias. This study clearly shows the significance of substrate bias in controlling the optical and mechanical properties of DLC films.

  20. Single step synthesis of (a-Fe2O3) hematite films by hydrothermal electrochemical deposition

    OpenAIRE

    2015-01-01

    A single step electrodeposition of alpha-Fe2O3 films under hydrothermal conditions without post-annealing requirement is described. Primary attention is paid to understand the effects of synthesis conditions, such as temperature, precursor concentration, pH, and time on the structure and morphology of the films. Moreover, the photoelectrochemical properties of hematite films grown by hydrothermal-electrochemical deposition (HED) are also discussed. It is discovered that HED enables the produc...

  1. Single step synthesis of (a-Fe2O3) hematite films by hydrothermal electrochemical deposition

    OpenAIRE

    Yılmaz, Ceren; Ünal, Uğur

    2015-01-01

    A single step electrodeposition of alpha-Fe2O3 films under hydrothermal conditions without post-annealing requirement is described. Primary attention is paid to understand the effects of synthesis conditions, such as temperature, precursor concentration, pH, and time on the structure and morphology of the films. Moreover, the photoelectrochemical properties of hematite films grown by hydrothermal-electrochemical deposition (HED) are also discussed. It is discovered that HED enables the produc...

  2. Surface modification by plasma polymerization: film deposition, tailoring of surface properties and biocompatibility

    OpenAIRE

    Os, van, J.

    2000-01-01

    The work described in this thesis concerns the surface modification of materials by thin film deposition in a plasma reactor. In particular, thin polymeric films bearing amine functionalities were synthesized by plasma polymerization of amino group containing monomers. In addition to the synthesis, attention was directed towards the characterization of these films, and the tailoring of their surface properties on a molecular level. Finally, the amino groups introduced by plasma polymerization...

  3. Sweep potential deposition of Tm-Ni-Co alloy films in dimethylsulfoxide

    Institute of Scientific and Technical Information of China (English)

    YUAN Dingsheng; LIU Yingliang; ZHANG Jingxian; LIU Guankun; TONG Yexiang

    2004-01-01

    The Tm-Ni-Co alloy films have been prepared by the sweep potential deposition technique. The surface appearance of Tm-Ni-Co alloy films was silver, smooth and adhesive. The surfaces of Tm-Ni-Co alloy films observed by scanning electron microscope (SEM) were uniform, adhesive and compact. The sizes of metallic grains were about 80-100 nm, 100-200 amorphous as proven by the X-ray diffraction (XRD).

  4. Thin alumina and silica films by chemical vapor deposition (CVD)

    OpenAIRE

    Hofman, R.; Morssinkhof, R.W.J.; Fransen, T.; Westheim, J.G.F.; Gellings, P.J.

    1993-01-01

    Alumina and silica coatings have been deposited by MOCVD (Metal Organic Chemical Vapor Deposition) on alloys to protect them against high temperature corrosion. Aluminium Tri-lsopropoxide (ATI) and DiAcetoxyDitertiaryButoxySilane (DAOBS) have been used as metal organic precursors to prepare these ceramic coatings. The influence of several process steps on the deposition rate and surface morphology is discussed. The deposition of SiO2 at atmospheric pressure is kinetically limited below 833 K ...

  5. Transformation of cadmium hydroxide to cadmium oxide thin films synthesized by SILAR deposition process: Role of varying deposition cycles

    Directory of Open Access Journals (Sweden)

    A.C. Nwanya

    2016-06-01

    Full Text Available Successive Ionic Layer Adsorption and Reaction (SILAR was used to deposit nanocrystalline cadmium oxide (CdO thin films on microscopic glass substrates for various cycles (40–120. This is based on alternate dipping of the substrate in CdCl2 solution made alkaline (pH ∼12 with NaOH, rinsing with distilled water, followed by air treatment with air dryer and annealing at 300 °C for 1 h in air. The prepared films were characterized by X-ray diffraction (XRD, UV–Visible Spectrophotomer (UV–Vis and Scanning Electron Microscopy (SEM. The 80th cycle was observed to be the saturation stage for this reaction. The XRD results confirmed the films to be CdO with some Cd(OH2 phase at higher deposition cycles. The films were polycrystalline in nature having high orientation along (111 and (200 planes. As the number of cycles increases the calculated average crystallite sizes increase gradually up till the 80th cycle after which a gradual decrease in the crystallite size was observed with increasing number of cycles. The films’ transmittance in the visible and near infrared region decreased as the number of cycles increased and ranged between 25 and 80%. This work shows the feasibility of using simple SILAR method at room temperature to obtain Cd(OH2 films which are transformed to CdO thin films after annealing.

  6. Study on the Microstructure and Electrical Properties of Boron and Sulfur Codoped Diamond Films Deposited Using Chemical Vapor Deposition

    Directory of Open Access Journals (Sweden)

    Zhang Jing

    2014-01-01

    Full Text Available The atomic-scale microstructure and electron emission properties of boron and sulfur (denoted as B-S codoped diamond films grown on high-temperature and high-pressure (HTHP diamond and Si substrates were investigated using atom force microscopy (AFM, scanning tunneling microscopy (STM, secondary ion mass spectroscopy (SIMS, and current imaging tunneling spectroscopy (CITS measurement techniques. The films grown on Si consisted of large grains with secondary nucleation, whereas those on HTHP diamond are composed of well-developed polycrystalline facets with an average size of 10–50 nm. SIMS analyses confirmed that sulfur was successfully introduced into diamond films, and a small amount of boron facilitated sulfur incorporation into diamond. Large tunneling currents were observed at some grain boundaries, and the emission character was better at the grain boundaries than that at the center of the crystal. The films grown on HTHP diamond substrates were much more perfect with higher quality than the films deposited on Si substrates. The local I-V characteristics for films deposited on Si or HTHP diamond substrates indicate n-type conduction.

  7. CdS/FTO thin film electrodes deposited by chemical bath deposition and by electrochemical deposition: A comparative assessment of photo-electrochemical characteristics

    Science.gov (United States)

    Zyoud, Ahed; Saa'deddin, Iyad; Khudruj, Sahar; Hawash, Zafer M.; Park, DaeHoon; Campet, Guy; Hilal, Hikmat S.

    2013-04-01

    CdS thin films have been deposited onto FTO/glass substrates by two different techniques, electrochemical deposition (ECD) and chemical bath deposition (CBD). Feasibility of using these two film types in photoelectrochemical processes has been critically investigated here. The films were comparatively characterized by a number of techniques (solid state absorption spectra, solid state photoluminescence spectra, XRD and SEM). PEC characteristics of the electrodes, including current density-voltage (J-V) plots, conversion efficiency (η), stability and fill-factor (FF) were then studied. The results show that both systems involved nano-sized CdS particles living in coagulates. The ECD was thinner and more uniform than the CBD system. The CBD films were more effective in PEC processes than the ECD counterparts. Effect of annealing on characteristics of both electrode systems has been investigated. Annealing enhanced both film characteristics, but the CBD was affected to a higher extent, and the annealed CBD film was more effective than the ECD counterpart.

  8. Synthesis and Characterization of In2S3 Thin Films Deposited by Chemical Bath Deposition on Polyethylene Naphthalate Substrates

    Science.gov (United States)

    Castelo-González, O. A.; Santacruz-Ortega, H. C.; Quevedo-López, M. A.; Sotelo-Lerma, M.

    2012-04-01

    Indium sulfide (In2S3) thin films were deposited on polyethylene naphthalate (PEN) by chemical bath deposition (CBD). The materials were characterized by ultraviolet (UV)-visible spectroscopy, x-ray photoelectron spectroscopy (XPS), energy-dispersive x-ray spectroscopy (EDX), scanning electron microscopy (SEM), and x-ray diffraction (XRD) to investigate the influence of the polymeric substrate on the resulting thin In2S3. The films showed polycrystalline (cubic and tetragonal) structure. A reduction of the ordering of the polymeric chains at the surface of the PEN was also observed, demonstrated by the appearance of two infrared bands at 1094 cm-1 and 1266 cm-1. Presence of oxygen during the early stages of In2S3 growth was also identified. We propose a reaction mechanism for both the equilibrium and nucleation stages. These results demonstrate that In2S3 can be deposited at room temperature on a flexible substrate.

  9. Engineering the Crystalline Morphology of Polymer Thin Films via Physical Vapor Deposition

    Science.gov (United States)

    Jeong, Hyuncheol; Arnold, Craig; Priestley, Rodney

    Thin-film growth via physical vapor deposition (PVD) has been successfully exploited for the delicate control of film structure for molecular and atomic systems. The application of such a high-energetic process to polymeric film growth has been challenged by chemical degradation. However, recent development of Matrix Assisted Pulsed Laser Evaporation (MAPLE) technique opened up a way to deposit a variety of macromolecules in a PVD manner. Here, employing MAPLE technique to the growth of semicrystalline polymer thin films, we show the engineering of crystalline film morphology can be achieved via manipulation of substrate temperature. This is accomplished by exploiting temperature effect on crystallization kinetics of polymers. During the slow film growth crystallization can either be permitted or suppressed, and crystal thickness can be tuned via temperature modulation. In addition, we report that the crystallinity of polymer thin films may be significantly altered with deposition temperature in MAPLE processing. We expect that this ability to manipulate crystallization kinetics during polymeric film growth will open the possibility to engineer structure in thin film polymeric-based devices in ways that are difficult by other means.

  10. Use of surface plasmon resonance to investigate lateral wall deposition kinetics and properties of polydopamine films.

    Science.gov (United States)

    Li, Hui; Cui, Dafu; Cai, Haoyuan; Zhang, Lulu; Chen, Xing; Sun, Jianhai; Chao, Yapeng

    2013-03-15

    Dopamine (DA) is a particularly important neurotransmitter. Polydopamine (pDA) films have been demonstrated to be important materials for the immobilization of biomolecules onto almost any type of solid substrate. In this study, a surface plasmon resonance (SPR)-based sensor system with the sensor chip surface parallel to the direction of gravity was used to investigate the lateral wall deposition kinetics and properties of pDA films. The deposition kinetics of pDA Films are limited by the oxidation process. The pDA film could not be removed from the sensor chip completely by a strongly alkaline solution, indicating that the pDA film was heterogeneous in the direction of deposition. The pDA film formed near the interior of the solution was less stable than the film formed near the gold-solution interface. Adsorption of proteins on pDA film was studied compared with that on bare gold and dextran sensor chip. The reduction of Au(111) cations by the pDA film, forming a layer of gold particles, was monitored using SPR.

  11. Interposition fixing structure of TiO2 film deposited on activated carbon fibers

    Institute of Scientific and Technical Information of China (English)

    FU Ping-feng; LUAN Yong; DAI Xue-gang

    2006-01-01

    The immobilized photocatalyst, TiO2 film supported on activated carbon fibers (TiO2/ACFs) prepared with molecular adsorption-deposition (MAD), exhibits high stability in cyclic photodegradation runs. The interposition fixing structure between TiO2 film and carbon fiber was investigated by means of SEM-EDX, XRD, XPS and FTIR, and a model was proposed to explain this structure. With SEM examination of carbon fiber surface after removing the deposited TiO2 film, a residual TiO2 super-thin film was found to exist still. By determining surface groups on ACFs, titanium sulfate (Ti2(SO4)3) in burnt remainders of the TiO2/ACFs was thought to be formed with an interfacial reaction between TiO2 film and carbon fibers. These provide some evidence of firm attachment of TiO2 film to carbon fiber surface. In the consideration of characteristics of the MAD, the deposition mechanism of TiO2 film on ACFs was proposed, and the interposition fixing structure was inferred to intercrossedly form between TiO2 film and ACFs' surface. This structure leaded to firm attachment and high stability of the TiO2 film.

  12. Comparison of hafnium silicate thin films on silicon (1 0 0) deposited using thermal and plasma enhanced metal organic chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Rangarajan, Vishwanathan; Bhandari, Harish; Klein, Tonya M

    2002-11-01

    Hafnium silicate thin films were deposited by metal organic chemical vapor deposition (MOCVD) on Si at 400 deg. C using hafnium (IV) t-butoxide. Films annealed in O{sub 2} were compared to as-deposited films using X-ray photoelectron spectroscopy and X-ray diffraction. Hafnium silicate films were deposited by both thermal and plasma enhanced MOCVD using 2% SiH{sub 4} in He as the Si precursor. An O{sub 2} plasma increased Si content to as much as {approx}26 at.% Si. Both thermal and plasma deposited Hf silicates are amorphous as deposited, however, thermal films exhibit crystallinity after anneal. Surface roughness as measured by atomic force microscopy was found to be 1.1 and 5.1 nm for MOCVD hafnium silicate and plasma enhanced MOCVD hafnium silicate, respectively.

  13. Fabrication of cuprous chloride films on copper substrate by chemical bath deposition

    Energy Technology Data Exchange (ETDEWEB)

    Lin, Yu-Ting; Ci, Ji-Wei; Tu, Wei-Chen [Department of Electronic Engineering, College of Electrical Engineering and Computer Science, Chung Yuan Christian University, Chung-Li 32023, Taiwan (China); Uen, Wu-Yih, E-mail: uenwuyih@ms37.hinet.net [Department of Electronic Engineering, College of Electrical Engineering and Computer Science, Chung Yuan Christian University, Chung-Li 32023, Taiwan (China); Lan, Shan-Ming [Department of Electronic Engineering, College of Electrical Engineering and Computer Science, Chung Yuan Christian University, Chung-Li 32023, Taiwan (China); Yang, Tsun-Neng; Shen, Chin-Chang; Wu, Chih-Hung [Institute of Nuclear Energy Research, P.O. Box 3-11, Lungtan 32500, Taiwan (China)

    2015-09-30

    Polycrystalline CuCl films were fabricated by chemical bath deposition (CBD) on a Cu substrate at a low solution temperature of 90 °C. Continuous CuCl films were prepared using the copper (II) chloride (CuCl{sub 2}) compound as the precursor for both the Cu{sup 2+} and Cl{sup −} sources, together with repeated HCl dip treatments. An HCl dip pretreatment of the substrate favored the nucleation of CuCl crystallites. Further, interrupting the film deposition and including an HCl dip treatment of the film growth surface facilitated the deposition of a full-coverage CuCl film. A dual beam (FIB/SEM) system with energy dispersive spectrometry facilities attached revealed a homogeneous CuCl layer with a flat-top surface and an average thickness of about 1 μm. Both the excitonic and biexcitonic emission lines were well-resolved in the 6.4 K photoluminescence spectra. In particular, the free exciton emission line was observable at room temperature, indicating the good quality of the CuCl films prepared by CBD. - Highlights: • Cuprous chloride (CuCl) was prepared on Cu substrate by chemical bath deposition. • HCl dip treatments facilitated the deposition of a full-coverage CuCl film. • A homogeneous elemental distribution was recognized for the deposited CuCl layer. • Excitonic and biexcitonic photoluminescence lines of CuCl films were well-resolved. • The free exciton emission line of CuCl films was observable at room temperature.

  14. High-Rate Vapor Deposition of Cadmium Telluride Films for Solar Cells

    Science.gov (United States)

    Khan, Nasim Akhter

    1992-01-01

    High rate vapor deposition is presently used for large scale low cost deposition of thin films for packaging and other applications. The feasibility of using this technology for low cost deposition of solar cells was explored. After an exhaustive literature survey, the cadmium telluride (CdTe) solar cell was found to be most suitable candidate for high rate vapor deposition. The high rate vapor deposition was investigated by sublimation with a short distance between sublimation source and the substrate (Close-Spaced Sublimation, CSS). Cadmium telluride (CdTe) solar cells were fabricated by depositing CdTe films at different rates on cadmium sulphide (CdS) films deposited by CSS or by evaporation. The CdTe films deposited at higher deposition rates were observed to have open circuit voltages (V_{ rm oc}) comparable to those deposited at lower rates. The effect of CdS film which acts as window layer for the cells were also investigated on the V_ {rm oc} of the solar cells. The results achieved proved the fact that CdS window layer is necessary to achieve higher V_{ rm oc} from solar cells. The substrate temperature during deposition of films by close space sublimation plays a vital role in the performance of solar cell. The increase in the substrate temperature during deposition of CdTe films increased the V_{rm oc} of solar cells. The solar cells with indium tin oxide (ITO) as top conductor, i.e. ITO/CdS/CdTe configuration were fabricated at rates up to 34 mum/minute and with tin oxide (TO) i.e. TO/CdTe configuration fabricated at rates up to 79 mum/minute have shown similar V_{rm oc} compared to those produced at lower rates. Higher CdTe film deposition rates are possible with larger capacity experimental setup. The method of contacting CdTe, used in this study, results in higher series resistance. An improved method of contacting CdTe needs to be developed.

  15. Influence of deposition rate on the properties of ZrO2 thin films prepared in electron beam evaporation method

    Institute of Scientific and Technical Information of China (English)

    Dongping Zhang(张东平); Meiqiong Zhan(占美琼); Ming Fang(方明); Hongbo He(贺洪波); Jianda Shao(邵建达); Zhengxiu Fan(范正修)

    2004-01-01

    ZrO2 thin films were prepared in electron beam thermal evaporation method. And the deposition rate changed from 1.3 to 6.3 nm/s in our study. X-ray diffractometer and spectrophotometer were employed to characterize the films. X-ray diffraction (XRD) spectra pattern shows that films structure changed from amorphous to polycrystalline with deposition rate increasing. The results indicate that internal stresses of the films are compressive in most case. Thin films deposited in our study are inhomogeneous, and the inhomogeneity is enhanced with the deposition rate increasing.

  16. Deposition and characterization of hydrogenated diamond-like carbon thin films on rubber seals

    NARCIS (Netherlands)

    Pei, Y.T.; Bui, X.L.; Hosson, J.Th.M. De

    2010-01-01

    Thin films of hydrogenated diamond-like carbon (DLC) have been deposited on hydrogenated nitrile butadiene rubber (HNBR) for reduction of friction and enhancement of wear resistance of dynamic rubber seals. The wax removal and pre-deposition plasma treatment of HNBR substrates are proven to be cruci

  17. On the environmental stability of ZnO thin films by spatial atomic layer deposition

    NARCIS (Netherlands)

    Illiberi, A.; Scherpenborg, R.; Theelen, M.; Poodt, P.; Roozeboom, F.

    2013-01-01

    Undoped and indium-doped ZnO films have been deposited by atmospheric spatial atomic-layer-deposition (spatial-ALD). The stability of their electrical, optical, and structural properties has been investigated by a damp-heat test in an environment with 85% relative humidity at 85 °C. The resistivity

  18. Effect of ion-assisted deposition on optical properties of thin films

    Science.gov (United States)

    Tang, Xuefei; Fan, Zhengxiu

    1990-12-01

    Effects of ion assisted deposition on the propertes of Ti02, Zr02 and 5102 optical coatings were investigated. Substrates were bombarded with different ions--- oxygen ions , argon ions , and the mixture ions of oxygen-argon during deposition. The refractive indices, optical absorptions and laser-induced damage thresholds (LIDT) measurments of these films are reported.

  19. Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions

    NARCIS (Netherlands)

    Valdesueiro Gonzalez, D.; Meesters, G.M.H.; Kreutzer, M.T.; Van Ommen, J.R.

    2015-01-01

    We have deposited aluminium oxide films by atomic layer deposition on titanium oxide nanoparticles in a fluidized bed reactor at 27 ± 3 °C and atmospheric pressure. Working at room temperature allows coating heat-sensitive materials, while working at atmospheric pressure would simplify the scale-up

  20. Modelling and optimization of film thickness variation for plasma enhanced chemical vapour deposition processes

    Science.gov (United States)

    Waddell, Ewan; Gibson, Des; Lin, Li; Fu, Xiuhua

    2011-09-01

    This paper describes a method for modelling film thickness variation across the deposition area within plasma enhanced chemical vapour deposition (PECVD) processes. The model enables identification and optimization of film thickness uniformity sensitivities to electrode configuration, temperature, deposition system design and gas flow distribution. PECVD deposition utilizes a co-planar 300mm diameter electrodes with separate RF power matching to each electrode. The system has capability to adjust electrode separation and electrode temperature as parameters to optimize uniformity. Vacuum is achieved using dry pumping with real time control of butterfly valve position for active pressure control. Comparison between theory and experiment is provided for PECVD of diamond-like-carbon (DLC) deposition onto flat and curved substrate geometries. The process utilizes butane reactive feedstock with an argon carrier gas. Radiofrequency plasma is used. Deposited film thickness sensitivities to electrode geometry, plasma power density, pressure and gas flow distribution are demonstrated. Use of modelling to optimise film thickness uniformity is demonstrated. Results show DLC uniformity of 0.30% over a 200 mm flat zone diameter within overall electrode diameter of 300mm. Thickness uniformity of 0.75% is demonstrated over a 200mm diameter for a non-conformal substrate geometry. Use of the modelling method for PECVD using metal-organic chemical vapour deposition (MOCVD) feedstock is demonstrated, specifically for deposition of silica films using metal-organic tetraethoxy-silane. Excellent agreement between experimental and theory is demonstrated for conformal and non-conformal geometries. The model is used to explore scalability of PECVD processes and trade-off against film thickness uniformity. Application to MEMS, optical coatings and thin film photovoltaics is discussed.

  1. Metallorganic chemical vapor deposition and atomic layer deposition approaches for the growth of hafnium-based thin films from dialkylamide precursors for advanced CMOS gate stack applications

    Science.gov (United States)

    Consiglio, Steven P.

    the properties of conductive HfN grown via plasma-assisted atomic layer deposition (PA-ALD) using tetrakis(ethylmethylamido)hafnium on a modified commercially available wafer processing tool. Key properties of these materials for use as gate stack replacement materials are addressed and future directions for further characterization and novel material investigations are proposed.

  2. Mechanism and prediction of failure of diamond films deposited on various substrates by HFCVD

    Institute of Scientific and Technical Information of China (English)

    ZHOU Ling-ping; SUN Xin-yuan; LI Shao-lu; LI De-yi; CHEN Xiao-hua

    2004-01-01

    Diamond films were deposited on the WC-Co cemented carbide and Si3N4 ceramic cutting tool substrates by hot-filament-assisted chemical vapour deposition. The adherence property of diamond films was estimated using the critical load (Pcr) in the indentation test. The adhesive strength of diamond films is related to the intermediate layer between the film and the substrate. Poor adhesion of diamond films to polished cemented carbide substrate is owing to the formation of graphite phase in the interface. The adhesion of diamond films deposited on acid etched cemented carbide substrate is improved, and the peeling-off of the films often happens in the loosen layer of WC particles where the cobalt element is nearly removed. The diamond films' adhesion to cemented carbide substrate whose surface layer is decarbonizated is strengthened dramatically because WC phase forms by reaction between the deposited carbon and tungsten in the surface layer of substrates during the deposition of diamond, which results in chemical combination in the film-substrate interface. The adhesion of diamond films to silicon nitride substrate is the firmest due to the formation of chemical combination of the SiC intermediate layer in the interfaces. In the piston-turning application, the diamond-coated Si3N4 ceramic and the cemented carbide cutting tools usually fail in the form of collapsing of edge and cracking or flaking respectively. They have no built-up edge(BUE) as long as coating is intact.As it wears through, BUE develops and the cutting force on it increases 1 - 3 times than that prior to failure. This can predict the failure of diamond-coated cutting tools.

  3. High quality antireflective ZnS thin films prepared by chemical bath deposition

    Energy Technology Data Exchange (ETDEWEB)

    Tec-Yam, S.; Rojas, J.; Rejon, V. [Centro de Investigacion y de Estudios Avanzados del IPN, Unidad Merida, Departamento de Fisica Aplicada, Km. 6 Antigua Carretera a Progreso, AP 73-Cordemex, 97310 Merida Yucatan (Mexico); Oliva, A.I., E-mail: oliva@mda.cinvestav.mx [Centro de Investigacion y de Estudios Avanzados del IPN, Unidad Merida, Departamento de Fisica Aplicada, Km. 6 Antigua Carretera a Progreso, AP 73-Cordemex, 97310 Merida Yucatan (Mexico)

    2012-10-15

    Zinc sulfide (ZnS) thin films for antireflective applications were deposited on glass substrates by chemical bath deposition (CBD). Chemical analysis of the soluble species permits to predict the optimal pH conditions to obtain high quality ZnS films. For the CBD, the ZnCl{sub 2}, NH{sub 4}NO{sub 3}, and CS(NH{sub 2}){sub 2} were fixed components, whereas the KOH concentration was varied from 0.8 to 1.4 M. Groups of samples with deposition times from 60 to 120 min were prepared in a bath with magnetic agitation and heated at 90 Degree-Sign C. ZnS films obtained from optimal KOH concentrations of 0.9 M and 1.0 M exhibited high transparency, homogeneity, adherence, and crystalline. The ZnS films presented a band gap energy of 3.84 eV, an atomic Zn:S stoichiometry ratio of 49:51, a transmittance above 85% in the 300-800 nm wavelength range, and a reflectance below 25% in the UV-Vis range. X-ray diffraction analysis revealed a cubic structure in the (111) orientation for the films. The thickness of the films was tuned between 60 nm and 135 nm by controlling the deposition time and KOH concentration. The incorporation of the CBD-ZnS films into ITO/ZnS/CdS/CdTe and glass/Mo/ZnS heterostructures as antireflective layer confirms their high optical quality. -- Highlights: Black-Right-Pointing-Pointer High quality ZnS thin films were prepared by chemical bath deposition (CBD). Black-Right-Pointing-Pointer Better CBD-ZnS films were achieved by using 0.9 M-KOH concentration. Black-Right-Pointing-Pointer Reduction in the reflectance was obtained for ZnS films used as buffer layers.

  4. Behaviour of Charge Carriers in As-Deposited and Annealed Undoped TCO Films

    Institute of Scientific and Technical Information of China (English)

    ZHOU Yan-Wen; WU Fa-Yu; ZHENG Chun-Yan

    2011-01-01

    We examine the structures, cut-off points of transmittance spectra and electric properties of undoped ZnO, SnO2 and CdO films by scanning electron microscopy, x-ray diffraction, spectrophotometer and Hall-effect measurements, respectively. The films are deposited by using an rf magnetron sputtering system from powder targets in argon and then annealed in vacuum. The structures and properties of the as-deposited films are compared with those of the annealed one. We try to explain the behaviour of charge carriers based on the semiconductor physics theory.%We examine the structures,cut-off points of transmittance spectra and electric properties of undoped ZnO,SnO2 and CdO films by scanning electron microscopy,x-ray diffraction,spectrophotometer and Hall-effect measurements,respectively.The films are deposited by using an rf magnetron sputtering system from powder targets in argon and then annealed in vacuum.The structures and properties of the as-deposited films are compared with those of the annealed one.We try to explain the behaviour of charge carriers based on the semiconductor physics Many studies about transparent conductive oxide (TCO) films have focused on the effects of deposition techniques,post-annealing parameters and dopants on the optical and electrical properties of the films.[1-11] It is believed that the microstructure and the charge carrier are the two key factors for the control of the electrical properties of TCO films.The integration of the crystals,which normally can be improved by post annealing treatment,may affect the mobility of charge carriers and hence the electrical properties of TCO films.

  5. Study of SnS2 thin film deposited by spin coating technique

    Science.gov (United States)

    Chaki, Sunil H.; Joshi, Hardikkumar J.; Tailor, Jiten P.; Deshpande, M. P.

    2017-07-01

    Thin film deposition of SnS2 was done by spin coating technique at ambient temperature. Deposition was done for different spin speed and spin time. The film thickness dependence on spin speed and spin time was studied. The spin speed was varied from 1000 rpm to 2000 rpm and spin time from 2 s to 6 s for constant speed of 1000 rpm. The elemental composition and crystal structure along with the phase of the as-deposited thin film was determined by the energy dispersive analysis of x-ray (EDAX) and x-ray diffraction (XRD) techniques respectively. The as-deposited thin film was found to be near stoichiometric and possess hexagonal crystal structure with determined lattice parameters in good agreement with the reported values. The crystallite size calculated from the XRD data using Scherrer’s formula and Hall-Williamson relation came out to be 9.77 nm and 6.49 nm, respectively. The transmission electron microscopy (TEM) study of spin deposited thin films showed the film to be continuous. Surface study of the as-deposited thin film was done by simple optical microscope and scanning electron microscope (SEM). The study showed that the deposited thin film to be flat and uniform without visible cracks and pores. The optical spectroscopy study of the as-deposited thin film showed that the optical bandgap value decreases with increase in film thickness. The d.c. electrical resistivity variation with temperature for spin coating as-deposited SnS2 film showed that the resistivity decreases with increase in temperature corroborating the semiconducting nature. The resistivity variation plot possesses two slopes. The temperature ranges showing two slopes lay between 300 to 383 K and 384 to 423 K having activation energy values for the two temperature ranges as 0.072 eV and 0.633 eV, respectively. The achieved results are deliberated in details.

  6. In situ X-ray diffraction based investigation of crystallization in solution deposited PZT thin films

    Science.gov (United States)

    Nittala, Krishna

    Solution deposited PZT based thin films have potential applications in embedded decoupling capacitors and pulse discharge capacitors. During solution deposition, precursor solution is deposited onto a substrate to obtain an amorphous film. The film is then crystallized by heating it at a high temperature (˜600 - 700°C). Conditions during the crystallization anneal such as precursor stoichiometry in solution, heating rate and adhesion layer in the substrate are known to influence phase and texture evolution in these films. However, a mechanistic understanding of the changes taking place in these thin films during crystallization is lacking. A better understanding of the crystallization processes in these thin films could enable tailoring the properties of thin films to suit specific applications. To explore the crystallization process in solution deposited PZT thin films, high temperature in situ laboratory and synchrotron X-ray diffraction based techniques were developed. Taking advantage of the high X-ray flux available at synchrotron facilities such as beamline 6-ID-B, Advanced Photon Source, Argonne National Laboratory, crystalline phases formed in the thin films during crystallization at the high heating rates (0.5 -- 60°C/s) typically used during film processing could be measured. Using a 2-D detector for these measurements allowed the simultaneous measurement of both phase and texture information during crystallization. Analytical treatment of the unconventional diffraction geometry used during the synchrotron based measurements was performed to develop methodologies for quantitative estimation of texture components. The nominal lead content in the starting solutions and the heating rate used during crystallization was observed to influence the sequence of phases formed during crystallization of the films. In films crystallized at fast heating rates, titanium segregation, probably due to diffusion of titanium from the adhesion layer, was observed. To

  7. Physical properties of chemical bath deposited CdS thin films

    Energy Technology Data Exchange (ETDEWEB)

    Ximello-Quiebras, J.N.; Contreras-Puente, G.; Aguilar-Hernandez, J. [Escuela Superior de Fisica y Matematicas-Instituto Politecnico Nacional, Edificio 9, U.P.A.L.M. 07738 DF (Mexico); Santana-Rodriguez, G.; Arias-Carbajal Readigos, A. [Facultad de Fisica IMRE, Universidad de la Habana, 10400 La Habana (Cuba)

    2004-05-01

    Cadmium sulfide films of different thicknesses were deposited by chemical bath deposition (CBD) from a bath containing cadmium chloride, ammonium chloride, ammonium hydroxide and thiourea. The XRD patterns show that the films have a hexagonal phase with a preferential (002) orientation. The photoluminescence spectra show a defect structure, characteristics of the CdS films obtained by CBD. The electrical behavior in dark and under illumination, the optical properties and the band gap value reported in this work is in agreement with that reported in the literature.

  8. Nanostructured diamond film deposition on curved surfaces of metallic temporomandibular joint implant

    Energy Technology Data Exchange (ETDEWEB)

    Fries, Marc D; Vohra, Yogesh K [Department of Physics, University of Alabama at Birmingham (UAB), Birmingham, AL (United States)

    2002-10-21

    Microwave plasma chemical vapour deposition of nanostructured diamond films was carried out on curved surfaces of Ti-6Al-4V alloy machined to simulate the shape of a temporomandibular joint (TMJ) dental implant. Raman spectroscopy shows that the deposited films are uniform in chemical composition along the radius of curvature of the TMJ condyle. Thin film x-ray diffraction reveals an interfacial carbide layer and nanocrystalline diamond grains in this coating. Nanoindentation hardness measurements show an ultra-hard coating with a hardness value of 60{+-}5 GPa averaged over three samples. (rapid communication)

  9. RAPID COMMUNICATION: Nanostructured diamond film deposition on curved surfaces of metallic temporomandibular joint implant

    Science.gov (United States)

    Fries, Marc D.; Vohra, Yogesh K.

    2002-10-01

    Microwave plasma chemical vapour deposition of nanostructured diamond films was carried out on curved surfaces of Ti-6Al-4V alloy machined to simulate the shape of a temporomandibular joint (TMJ) dental implant. Raman spectroscopy shows that the deposited films are uniform in chemical composition along the radius of curvature of the TMJ condyle. Thin film x-ray diffraction reveals an interfacial carbide layer and nanocrystalline diamond grains in this coating. Nanoindentation hardness measurements show an ultra-hard coating with a hardness value of 60+/-5 GPa averaged over three samples.

  10. Aligned carbon nanotube, graphene and graphite oxide thin films via substrate-directed rapid interfacial deposition.

    Science.gov (United States)

    D'Arcy, Julio M; Tran, Henry D; Stieg, Adam Z; Gimzewski, James K; Kaner, Richard B

    2012-05-21

    A procedure for depositing thin films of carbon nanostructures is described that overcomes the limitations typically associated with solution based methods. Transparent and conductively continuous carbon coatings can be grown on virtually any type of substrate within seconds. Interfacial surface tension gradients result in directional fluid flow and film spreading at the water/oil interface. Transparent films of carbon nanostructures are produced including aligned ropes of single-walled carbon nanotubes and assemblies of single sheets of chemically converted graphene and graphite oxide. Process scale-up, layer-by-layer deposition, and a simple method for coating non-activated hydrophobic surfaces are demonstrated.

  11. EFFECT OF RESIDUAL STRESS ON THE MARTENSITIC TRANS- FORMATION OF SPUTTER-DEPOSITED SMA THIN FILMS

    Institute of Scientific and Technical Information of China (English)

    L. Wang; D. Xu; B.C. Cai

    2002-01-01

    TiNi thin films were sputter-deposited on circular single-crystal silicon substrates un-der various sputtering parameters. The crystal structure and residual stress of the as-deposited films were determined by X-ray diffraction and substrate-curvature method.The phenomenon of stress-suppressed martensitic transformation was observed. It isconsidered that the residual stresses in SMA thin films based on circular substratesact as balanced biaxial tensile stresses. The status of equilibrant delays the align-ment of self-accommodated variants and the volume shrinkage during the martensitictransformation.

  12. Optimization of deposition temperature of SILAR Cu-rich CuInS2 thin films

    Science.gov (United States)

    Maheswari, B.; Dhanam, M.

    2013-04-01

    CuInS2 (CIS) is studied widely as a promising absorber material for high efficient and low cost thin film solar cells. CIS thin films are prepared on soda lime glass substrates using Successive Ionic Layer Adsorption and Reaction (SILAR) technique at different deposition temperatures (40 to 70 °C). The structural, compositional and optical properties are studied with x-ray diffractometer, energy dispersive x-ray analyzer and spectrophotometer. The influence of the deposition temperature on the properties of CIS thin films is discussed in this paper in detail.

  13. Ionization sensitization of doping in co-deposited organic semiconductor films

    Energy Technology Data Exchange (ETDEWEB)

    Shinmura, Yusuke, E-mail: shinmura@ims.ac.jp; Yamashina, Yohei; Kaji, Toshihiko; Hiramoto, Masahiro [Institute for Molecular Science, 5-1 Higashiyama, Myodaiji, Okazaki 444-8787, Aichi (Japan); JST, CREST, 5 Sanbancho, Chiyoda-ku, Tokyo 102-0075 (Japan)

    2014-11-03

    Sensitization of the dopant ionization in co-deposited films of organic semiconductors was found. The ionization rate of cesium carbonate (Cs{sub 2}CO{sub 3}), which acts as a donor dopant in single films of metal-free phthalocyanine (H{sub 2}Pc) and fullerene (C{sub 60}), was increased from 10% to 97% in a H{sub 2}Pc:C{sub 60} co-deposited film. A charge separation superlattice model that includes electron transfer from the conduction band of H{sub 2}Pc to that of C{sub 60}, which increases the rate of dopant ionization, is proposed.

  14. SnOx Thin Films Deposited by Reactive Magnetron Sputtering for Microbatteries Anodes

    Institute of Scientific and Technical Information of China (English)

    XING Guang-jian; YANG Zhi-min; SHEN Wan; MAO Chang-hui; DU Jun

    2004-01-01

    SnOx thin films, with various oxygen deficiencies, are deposited from a Sn target on to silicon substratesby reactive magnetron sputtering. The SnOx films are characterized by X-ray diffraction ( XRD ) and X-ray photoelectron spectroscopy(XPS). Influences of deposition conditions such as oxygen partial pressure and annealing temperature on the characteristicsof the films are discussed in detail. The high reversible capacity and cycle performance characteristics of SnOxare also described. The results show that stoichiometric parameter x increases with the increase in oxygen partial pressure. The chargedischarge performance of the SnOxfilms is found to be dependent on x value.

  15. A novel electron beam evaporation technique for the deposition of superconducting thin films

    Science.gov (United States)

    Krishna, M. G.; Muralidhar, G. K.; Rao, K. N.; Rao, G. M.; Mohan, S.

    1991-05-01

    Superconducting thin films of BiSrCaCuO have been deposited using a novel electron beam evaporation technique. In this technique the crucible has a groove around its circumference and rotates continuously during deposition. The source material is loaded in the form of pellets of the composite. Both oxides as well as flourides have been used in the starting material and a comparison of the film properties has been made. The best film was obtained on a MgO(100) substrate with a Tc onset at 85 K and Tc zero at 77 K using calcium flouride in the source material.

  16. Studies on chemical bath deposited zinc sulphide thin films with special optical properties

    Energy Technology Data Exchange (ETDEWEB)

    Ladar, Maria [Faculty of Chemistry and Chemical Engineering, ' Babes-Bolyai' University, 400028 Cluj-Napoca (Romania); ' Raluca Ripan' Institute for Research in Chemistry, 30 Fantanele, 400294 Cluj-Napoca (Romania); Popovici, Elisabeth-Jeanne [' Raluca Ripan' Institute for Research in Chemistry, 30 Fantanele, 400294 Cluj-Napoca (Romania)]. E-mail: jennypopovici@yahoo.com; Baldea, Ioan [Faculty of Chemistry and Chemical Engineering, ' Babes-Bolyai' University, 400028 Cluj-Napoca (Romania); Grecu, Rodica [' Raluca Ripan' Institute for Research in Chemistry, 30 Fantanele, 400294 Cluj-Napoca (Romania); Indrea, Emil [National Institute for R and D of Isotopic and Molecular Technology, Donath 71-103, 400293 Cluj-Napoca (Romania)

    2007-05-31

    Adherent and uniform zinc sulphide thin films were deposited on optical glass platelets from chemical bath containing thiourea, zinc acetate, ammonia and sodium citrate. The samples, as they were prepared were investigated by UV-vis absorption/reflection spectroscopy, fluorescence spectroscopy and X-ray diffraction. The effects of growth conditions such as reagent concentration and deposition technique (mono- and multi-layer) on optical and structural properties of the ZnS thin films have been studied. The ability of ZnS films to exhibit luminescent properties has also been investigated.

  17. Deposition of SiOx films by means of atmospheric pressure microplasma jets

    CERN Document Server

    Benedikt, Jan; Ellerweg, Dirk; Rügner, Katja; von Keudell, Achim

    2011-01-01

    Atmospheric pressure plasma jet sources are currently in the focus of many researchers for their promising applications in medical industry (e.g. treatment of living tissues), surface modification or material etching or synthesis. Here we report on the study of fundamental principles of deposition of SiOx films from microplasma jets with admixture of hexamethyldisiloxane [(CH3)3SiOSi(CH3)3, HMDSO] molecules and oxygen. The properties of the deposited films, the composition of the plasma as measured by molecular beam mass spectrometry and the effect of additional treatment of grown film by oxygen or hydrogen atoms will be presented.

  18. The Effect of Deposition Rate on Electrical, Optical and Structural Properties of ITO Thin Films

    Directory of Open Access Journals (Sweden)

    P. S. Raghupathi

    2005-01-01

    Full Text Available Indium tin oxide (ITO thin films have been prepared using the reactive evaporation technique on glass substrates in an oxygen atmosphere. It is found that the deposition rate plays prominent role in controlling the electrical and optical properties of the ITO thin films. Resistivity, electrical conductivity, activation energy, optical transmission and band gap energy were investigated. A transmittance value of more than 90% in the visible region of the spectrum and an electrical conductivity of 3x10–6 Ωm has been obtained with a deposition rate of 2 nm/min. XRD studies showed that the films are polycrystalline.

  19. The role of oxygen in the deposition of copper–calcium thin film as diffusion barrier for copper metallization

    Energy Technology Data Exchange (ETDEWEB)

    Yu, Zhinong, E-mail: znyu@bit.edu.cn [School of Optoelectronics and Beijing Engineering Research Center of Mixed Reality and Advanced Display, Beijing Institute of Technology, Beijing 100081 (China); Ren, Ruihuang [School of Optoelectronics and Beijing Engineering Research Center of Mixed Reality and Advanced Display, Beijing Institute of Technology, Beijing 100081 (China); Xue, Jianshe; Yao, Qi; Li, Zhengliang; Hui, Guanbao [Beijing BOE Optoelectronics Technology Co., Ltd, Beijing 100176 (China); Xue, Wei [School of Optoelectronics and Beijing Engineering Research Center of Mixed Reality and Advanced Display, Beijing Institute of Technology, Beijing 100081 (China)

    2015-02-15

    Highlights: • The CuCa film as the diffusion barrier of Cu film improves the adhesion of Cu film. • The introduction of oxygen into the deposition of CuCa film is necessary to improve the adhesion of Cu film. • The CuCa alloy barrier layer deposited at oxygen atmosphere has perfect anti-diffusion between Cu film and substrate. - Abstract: The properties of copper (Cu) metallization based on copper–calcium (CuCa) diffusion barrier as a function of oxygen flux in the CuCa film deposition were investigated in view of adhesion, diffusion and electronic properties. The CuCa film as the diffusion barrier of Cu film improves the adhesion of Cu film, however, and increases the resistance of Cu film. The introduction of oxygen into the deposition of CuCa film induces the improvement of adhesion and crystallinity of Cu film, but produces a slight increase of resistance. The increased resistance results from the partial oxidation of Cu film. The annealing process in vacuum further improves the adhesion, crystallinity and conductivity of Cu film. X-ray diffraction (XRD) and Auger electron spectroscopy (AES) show that the CuCa alloy barrier layer deposited at oxygen atmosphere has perfect anti-diffusion between Cu film and substrate due to the formation of Ca oxide in the interface of CuCa/substrate.

  20. Dopamine-melanin film deposition depends on the used oxidant and buffer solution.

    Science.gov (United States)

    Bernsmann, Falk; Ball, Vincent; Addiego, Frédéric; Ponche, Arnaud; Michel, Marc; Gracio, José Joaquin de Almeida; Toniazzo, Valérie; Ruch, David

    2011-03-15

    The deposition of "polydopamine" films, from an aqueous solution containing dopamine or other catecholamines, constitutes a new and versatile way to functionalize solid-liquid interfaces. Indeed such films can be deposited on almost all kinds of materials. Their deposition kinetics does not depend markedly on the surface chemistry of the substrate, and the films can reach thickness of a few tens of nanometers in a single reaction step. Up to now, even if a lot is known about the oxidation mechanism of dopamine in solution, only little information is available to describe the deposition mechanism on surfaces either by oxidation in solution or by electrodeposition. The deposition kinetics of melanin was only investigated from dopamine solutions using oxygen or ammonium persulfate as an oxidant and from a tris(hydroxymethyl) aminomethane (Tris) containing buffer solutions at pH 8.5. Many other oxidants could be used, and the buffer agent containing a primary amine group may influence the deposition process. Herein we show that the deposition kinetics of melanin from dopamine containing buffers at pH 8.5 can be markedly modified using Cu(2+) instead of O2 as an oxidant: the deposition kinetics remains linear up to thicknesses of more than 70 nm, whereas the film growth stops at 45 ± 5 nm in the presence of 02. In addition, the films prepared from Cu(2+) containing solutions display an absorption spectrum with defined peaks at 320 and 370 nm, which are absent in the spectra of films prepared in oxygenated solutions. The replacement of Tris buffer by phosphate buffer also has a marked effect on the melanin deposition kinetics.

  1. Optical and electrical properties of thin NiO films deposited by reactive magnetron sputtering and spray pyrolysis

    Science.gov (United States)

    Parkhomenko, H. P.; Solovan, M. N.; Mostovoi, A. I.; Orletskii, I. G.; Parfenyuk, O. A.; Maryanchuk, P. D.

    2017-06-01

    Thin NiO films are deposited by reactive magnetron sputtering and spray pyrolysis. The main optical constants, i.e., refractive index n(λ), absorption coefficient α(λ), extinction coefficient k(λ), and thickness d, are determined. The temperature dependence of the resistance of thin films is found, and the activation energy of films deposited by different methods is determined.

  2. Low-temperature deposition of transparent diamond films with a microwave cavity plasma reactor

    Science.gov (United States)

    Ulczynski, Michael J.

    1998-10-01

    Low-temperature diamond deposition with Microwave Cavity Plasma Reactor (MCPR) technology was investigated for application to temperature sensitive substrates. The substrate temperature during most CVD diamond deposition processes is typically greater then 600 C; however, there are some applications where temperature sensitive materials are used and the deposition temperature must be maintained below 550 C. These applications include materials like boro-silicate glass, which has a relatively low strain-point temperature, and integrated circuits that contain low melting point components. Experiments were conducted in three areas. The first area was MCPR development, the second was benchmark deposition and characterization of diamond films on silicon substrates and the third was deposition and characterization of diamond films on boro-silicate glass substrates. MCPR development included an investigation of various MCPR configurations that were designed and adapted for uniform, low-temperature diamond deposition over areas as large as 80-cm2. Reactors were investigated with end-feed microwave excitation and side-feed microwave excitation for maximum deposition area and uniformity. Various substrate receptor configurations were also investigated including a substrate heater and cooler. From these investigations, deposition parameters such as substrate temperature, deposition rate, deposition area and deposition uniformity were characterized. The benchmark silicon diamond deposition experiments were conducted for comparison to previous high temperature, >550 C, MCPR research and growth models. Here deposition results such as deposition rate and film quality were compared with applications of diamond growth models by Harris-Goodwin and Bachmann. Additionally, characterization experiments were conducted to investigate film attributes that are critical to optical applications, such as film surface roughness and deposition uniformity. Included as variables in these

  3. Helium-Charged Titanium Films Deposited by Pulsed Laser Deposition in an Electron-Cyclotron-Resonance Helium Plasma Environment

    Institute of Scientific and Technical Information of China (English)

    金钦华; 胡佩钢; 凌浩; 吴嘉达; 施立群; 周筑颖

    2003-01-01

    Titanium thin films incorporated with helium are produced by pulsed laser deposition in an electron cyclotron resonance helium plasma environment. Helium is distributed evenly in the film and a relatively high He/Ti atomic ratio (~ 20%) is obtained from the proton backscattering spectroscopy. This high concentration ofhelium leads to a surface blistering which is observed by scanning electron microscopy. Laser repetition rate has little influence on film characters. Substrate bias voltage is also changed for the helium incorporating mechanism study, and this is a helium ion implantation process during the film growth. Choosing suitable substrate bias voltage, one can avoid the damage produced by ion implantation, which is always present in general implantation case.

  4. Effect of deposition temperature on the structural, morphological and optical band gap of lead selenide thin films synthesized by chemical bath deposition method

    Energy Technology Data Exchange (ETDEWEB)

    Hone, Fekadu Gashaw, E-mail: fekeye@gmail.com [Hawassa University, Department of Physics, Hawassa (Ethiopia); Ampong, Francis Kofi [Kwame Nkrumah University of Science and Technology, Department of Physics, Kumasi (Ghana)

    2016-11-01

    Lead selenide (PbSe) nanocrystalline thin films have been deposited on silica glass substrates by the chemical bath deposition technique. The samples were deposited at the bath temperatures of 60, 75 and 90 °C respectively and characterized by a variety of techniques. The XRD results revealed that the PbSe thin film deposited at 60 °C was amorphous in nature. Films deposited at higher temperatures exhibited sharp and intense diffraction peaks, indicating an improvement in crystallinety. The deposition temperature also had a strong influence on the preferred orientation of the crystallites as well as other structural parameters such as microstrain and dislocation density. From the SEM study it was observed that film deposited at 90 °C had well defined crystallites, uniformly distributed over the entire surface of the substrate. The EDAX study confirmed that the samples deposited at the higher temperature had a better stoichiometric ratio. The optical band gap varied from 2.26 eV to 1.13 eV with increasing deposition temperature. - Highlights: • The crystallinety of the films improved as the deposition temperature increased. • The deposition temperature strongly influenced the preferred orientations. • Microstrain and dislocation density are decreased linearly with deposition temperature. • Band gap decreased from 2.26 eV to 1.13 eV as the deposition temperature increased.

  5. Indium sulfide thin films as window layer in chemically deposited solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Lugo-Loredo, S. [Universidad Autónoma de Nuevo León, UANL, Fac. de Ciencias Químicas, Av. Universidad S/N Ciudad Universitaria San Nicolás de Los Garza Nuevo León, C.P. 66451 (Mexico); Peña-Méndez, Y., E-mail: yolapm@gmail.com [Universidad Autónoma de Nuevo León, UANL, Fac. de Ciencias Químicas, Av. Universidad S/N Ciudad Universitaria San Nicolás de Los Garza Nuevo León, C.P. 66451 (Mexico); Calixto-Rodriguez, M. [Universidad Tecnológica Emiliano Zapata del Estado de Morelos, Av. Universidad Tecnológica No. 1, C.P. 62760 Emiliano Zapata, Morelos (Mexico); Messina-Fernández, S. [Universidad Autónoma de Nayarit, Ciudad de la Cultura “Amado Nervo” S/N, C.P. 63190 Tepic, Nayarit (Mexico); Alvarez-Gallegos, A. [Universidad Autónoma del Estado de Morelos, Centro de Investigación en Ingeniería y Ciencias Aplicadas, Av. Universidad 1001, C.P. 62209, Cuernavaca Morelos (Mexico); Vázquez-Dimas, A.; Hernández-García, T. [Universidad Autónoma de Nuevo León, UANL, Fac. de Ciencias Químicas, Av. Universidad S/N Ciudad Universitaria San Nicolás de Los Garza Nuevo León, C.P. 66451 (Mexico)

    2014-01-01

    Indium sulfide (In{sub 2}S{sub 3}) thin films have been synthesized by chemical bath deposition technique onto glass substrates using In(NO{sub 3}){sub 3} as indium precursor and thioacetamide as sulfur source. X-ray diffraction studies have shown that the crystalline state of the as-prepared and the annealed films is β-In{sub 2}S{sub 3}. Optical band gap values between 2.27 and 2.41 eV were obtained for these films. The In{sub 2}S{sub 3} thin films are photosensitive with an electrical conductivity value in the range of 10{sup −3}–10{sup −7} (Ω cm){sup −1}, depending on the film preparation conditions. We have demonstrated that the In{sub 2}S{sub 3} thin films obtained in this work are suitable candidates to be used as window layer in thin film solar cells. These films were integrated in SnO{sub 2}:F/In{sub 2}S{sub 3}/Sb{sub 2}S{sub 3}/PbS/C–Ag solar cell structures, which showed an open circuit voltage of 630 mV and a short circuit current density of 0.6 mA/cm{sup 2}. - Highlights: • In{sub 2}S{sub 3} thin films were deposited using the Chemical Bath Deposition technique. • A direct energy band gap between 2.41 to 2.27 eV was evaluated for the In{sub 2}S{sub 3} films. • We made chemically deposited solar cells using the In{sub 2}S{sub 3} thin films.

  6. The adsorptive-kinetic model of in-situ phosphorus doped film polysilicon deposition process

    Directory of Open Access Journals (Sweden)

    Nalivaiko O. Yu.

    2009-11-01

    Full Text Available The investigation of deposition kinetics of in-situ phosphorus doped polysilicon films has been performed. The adsorptive-kinetic model of in-situ phosphorus doped polysilicon deposition has been developed. The values of heterogeneous reaction constants and constants, which describe the desorption process for monosilane and phosphine, have been defined. The optimal process conditions, which provide the acceptable deposition rate, thickness uniformity, high doping level and conformal step coverage, have been founded.

  7. Photocatalytic property of titanium dioxide thin films deposited by radio frequency magnetron sputtering in argon and water vapour plasma

    Energy Technology Data Exchange (ETDEWEB)

    Sirghi, L., E-mail: lsirghi@uaic.ro [Department of Physics, Alexandru Ioan Cuza University, Blvd. Carol I, 11, Iasi, 700506 (Romania); Hatanaka, Y. [Research Institute of Electronics, Shizuoka University, 3-5-1, Johoku Naka-ku Hamamatsu, 432-8011 (Japan); Sakaguchi, K. [Faculty of Engineering, Aichi University of Technology, 50-2 Manori, Nishihazama, Gamagori, 443-0047 Aichi (Japan)

    2015-10-15

    Highlights: • TiOx thin films were deposited by radio frequency magnetron sputtering in Ar and Ar/H{sub 2}O plasma. • The deposited films contain OH groups in their bulk structure irrespective of the water content of the working gas. • The structure and photocatalytic activity of the deposited films were studied. - Abstract: The present work is investigating the photocatalytic activity of TiO{sub 2} thin films deposited by radiofrequency magnetron sputtering of a pure TiO{sub 2} target in Ar and Ar/H{sub 2}O (pressure ratio 40/3) plasmas. Optical absorption, structure, surface morphology and chemical structure of the deposited films were comparatively studied. The films were amorphous and included a large amount of hydroxyl groups (about 5% of oxygen atoms were bounded to hydrogen) irrespective of the intentional content of water in the deposition chamber. Incorporation of hydroxyl groups in the film deposited in pure Ar plasma is explained as contamination of the working gas with water molecules desorbed by plasma from the deposition chamber walls. However, intentional input of water vapour into the discharge chamber decreased the deposition speed and roughness of the deposited films. The good photocatalytic activity of the deposited films could be attributed hydroxyl groups in their structures.

  8. Atomic force microscopic characterization of films grown by inverse pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Egerhazi, L. [Department of Optics and Quantum Electronics, University of Szeged, P.O. Box 406, H-6701 Szeged (Hungary); Geretovszky, Zs. [Department of Optics and Quantum Electronics, University of Szeged, P.O. Box 406, H-6701 Szeged (Hungary); Csako, T. [Department of Optics and Quantum Electronics, University of Szeged, P.O. Box 406, H-6701 Szeged (Hungary); Szoerenyi, T. [Research Group on Laser Physics of the Hungarian Academy of Sciences, University of Szeged, P.O. Box 406, H-6701 Szeged (Hungary)]. E-mail: t.szorenyi@physx.u-szeged.hu

    2006-04-30

    Carbon nitride films have been deposited by KrF excimer laser ablation of a rotating graphite target in 5 Pa nitrogen ambient in an inverse pulsed laser deposition configuration, where the backward motion of the ablated species is utilised for film growth on substrates lying in the target plane. Topometric AFM scans of the films, exhibiting elliptical thickness distribution, have been recorded along the axes of symmetry of the deposition area. High resolution AFM scans revealed the existence of disk-like, or somewhat elongated rice-like features of 5-10 nm average thickness and {approx}100 nm largest dimension, densely packed over the whole, approximately 14 x 10 cm{sup 2} deposition area. The RMS roughness of the film decreased from 9 nm near to the laser spot down to 2 nm in the outer regions. Even the highest RMS value obtained for IPLD films was less than half of the typical, 25 nm roughness measured on simultaneously deposited PLD films.

  9. A comparative study of CdS thin films deposited by different techniques

    Energy Technology Data Exchange (ETDEWEB)

    Pérez-Hernández, G., E-mail: german.perez@ujat.mx [Universidad Juárez Autónoma de Tabasco, Avenida Universidad s/n, Col. Magisterial, Villahermosa, Tabasco 86040 (Mexico); Pantoja-Enríquez, J. [Centro de Investigación y Desarrollo Tecnológico en Energías Renovables, UNICACH, Libramiento Norte No 1150, Tuxtla Gutiérrez, Chiapas 29039 (Mexico); Escobar-Morales, B. [Instituto Tecnológico de Cancún, Avenida Kábah Km 3, Cancún, Quintana Roo 77500 (Mexico); Martinez-Hernández, D.; Díaz-Flores, L.L.; Ricardez-Jiménez, C. [Universidad Juárez Autónoma de Tabasco, Avenida Universidad s/n, Col. Magisterial, Villahermosa, Tabasco 86040 (Mexico); Mathews, N.R.; Mathew, X. [Centro de Investigación en Energía, Universidad Nacional Autónoma de México, Temixco, Morelos 62580 (Mexico)

    2013-05-01

    Cadmium sulfide thin-films were deposited on glass slides and SnO{sub 2}:F coated glass substrates by chemical bath deposition, sputtering and close-spaced sublimation techniques. The films were studied for the structural and opto-electronic properties after annealing in an ambient identical to that employed in the fabrication of CdTe/CdS devices. Quantum efficiency of the CdTe/CdS solar cells fabricated with CdS buffer films prepared by the three methods were investigated to understand the role of CdS film preparation method on the blue response of the devices. The higher blue response observed for the devices fabricated with chemical bath deposited CdS film is discussed. - Highlights: ► CdS films were prepared by different techniques. ► Role of CdS on the blue response of device was studied. ► Structural and optical properties of CdS were analyzed. ► Chemically deposited CdS has high blue transmittance. ► CdS deposition method influences diffusion of S and Te.

  10. Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes

    Energy Technology Data Exchange (ETDEWEB)

    Part, Marko, E-mail: markopa@ut.ee [University of Tartu, Institute of Physics, Department of Materials Science, Riia 142, EE-51014 Tartu (Estonia); Tamm, Aile; Kozlova, Jekaterina; Mändar, Hugo; Tätte, Tanel [University of Tartu, Institute of Physics, Department of Materials Science, Riia 142, EE-51014 Tartu (Estonia); Kukli, Kaupo [University of Tartu, Institute of Physics, Department of Materials Science, Riia 142, EE-51014 Tartu (Estonia); University of Helsinki, Department of Chemistry, P.O. Box 55, FI-00014, Univ. Helsinki (Finland)

    2014-02-28

    Deposition of MgO thin film on nanocrystalline yttria-stabilized zirconia microtubes was investigated. The microtubes were prepared by self-formation from threads drawn directly from zirconium butoxide [Zr(OBu){sub 4}] precursor and heat treated at 800 °C. The tubes possessed 100% tetragonal phase, their typical outer diameter was 50 μm, inner diameter 30 μm and length 1 cm. MgO films were deposited from β-diketonate-type precursor 2,2,6,6-tetramethyl-heptanedionato-3,5-magnesium(II) at 220 °C by atomic layer deposition. Thickness of MgO film on microtubes was 15.8 nm and growth rate 0.105 Å/cycle. - Highlights: • MgO films were deposited on the surface of yttria-stabilized zirconia microtubes. • The studies are carried out on the basis of surface modification of microtubes. • Films were deposited from β-diketonate-type precursor Mg(thd){sub 2}. • The growth temperature of MgO film was 220 °C.

  11. Electrophoretic deposition of hyaluronic acid and composite films for biomedical applications

    Science.gov (United States)

    Ma, R.; Li, Y.; Zhitomirsky, I.

    2010-06-01

    Hyaluronic acid (HYH) is a natural biopolymer, which has tremendous potential for various biomedical applications. Electrophoretic deposition (EPD) methods have been developed for the fabrication of HYH films and composites. New methods for the immobilization of drugs and proteins have been utilized for the fabrication of organic composites. Electrophoretic deposition enabled the fabrication of organic-inorganic composites containing bioceramics and bioglass in the HYH matrix. It was shown that the deposition yield, microstructure, and composition of the films can be controlled. Potential applications of EPD for the surface modification of biomedical implants and fabrication of biosensors are highlighted.

  12. Deposition of dielectric films on silicon using a fore-vacuum plasma electron source.

    Science.gov (United States)

    Zolotukhin, D B; Oks, E M; Tyunkov, A V; Yushkov, Yu G

    2016-06-01

    We describe an experiment on the use of a fore-vacuum-pressure, plasma-cathode, electron beam source with current up to 100 mA and beam energy up to 15 keV for deposition of Mg and Al oxide films on Si substrates in an oxygen atmosphere at a pressure of 10 Pa. The metals (Al and Mg) were evaporated and ionized using the electron beam with the formation of a gas-metal beam-plasma. The plasma was deposited on the surface of Si substrates. The elemental composition of the deposited films was analyzed.

  13. Functional porphyrin thin films deposited by matrix assisted pulsed laser evaporation

    Energy Technology Data Exchange (ETDEWEB)

    Cristescu, R., E-mail: rodica.cristescu@inflpr.ro [National Institute for Lasers, Plasma and Radiation Physics, Lasers Department, P.O. Box MG-36, Atomistilor 409, Bucharest-Magurele (Romania); Popescu, C.; Popescu, A.C.; Mihailescu, I.N. [National Institute for Lasers, Plasma and Radiation Physics, Lasers Department, P.O. Box MG-36, Atomistilor 409, Bucharest-Magurele (Romania); Ciucu, A.A. [Univeristy of Bucharest, Chemistry Department, Bucharest (Romania); Andronie, A.; Iordache, S.; Stamatin, I. [University of Bucharest, 3 Nano-SAE Research Center, P.O. Box MG-38, Bucharest-Magurele (Romania); Fagadar-Cosma, E. [Institute of Chemistry Timisoara of Romanian Academy, Department of Organic Chemistry, 300223 Timisoara (Romania); Chrisey, D.B. [Rensselaer Polytechnic Institute, School of Engineering, Department of Materials Science and Engineering, Troy 12180-3590, NY (United States)

    2010-05-25

    We report the first successful deposition of functionalized and nanostructured Zn(II)- and Co(II)-metalloporphyrin thin films by matrix assisted pulsed laser evaporation onto silicon wafers, quartz plates and screen-printed electrodes. The deposited nanostructures have been characterized by Raman spectrometry and cyclic voltammetry. The novelty of our contribution consists of the evaluation of the sensitivity of the MAPLE-deposited Zn(II)- and Co(II)-metalloporphyrin thin films on screen-printed carbon nanotube electrodes when challenged with dopamine.

  14. Deposition of CdTe films under microgravity: Foton M3 mission

    Energy Technology Data Exchange (ETDEWEB)

    Benz, K.W.; Croell, A. [Freiburger Materialforschungszentrum FMF, Albert-Ludwigs-Universitaet Freiburg (Germany); Zappettini, A.; Calestani, D. [CNR Parma, Instituto Materiali Speciali per Elettronica e Magnetismo IMEM, Fontani Parma (Italy); Dieguez, E. [Universidad Autonoma de Madrid (Spain). Departamento de Fisica de Materiales; Carotenuto, L.; Bassano, E. [Telespazio Napoli, Via Gianturco 31, 80146 Napoli (Italy); Fiederle, M.

    2009-10-15

    Experiments of deposition of CdTe films have been carried out under microgravity in the Russian Foton M3 mission. The influence of gravity has been studied with these experiments and compared to the results of simulations. The measured deposition rate could be confirmed by the theoretical results for lower temperatures. For higher temperatures the measured thickness of the deposited films was larger compared to the theoretical data. (copyright 2009 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  15. Atmospheric growth of ZnO films deposited by spray pyrolysis using diethylzinc solution

    Science.gov (United States)

    Imai, Masato; Watanabe, Marin; Mochihara, Akiko; Tominaga, Himeka; Yoshino, Kenji; Shen, Qing; Toyoda, Taro; Hayase, Shuzi

    2017-06-01

    Non-doped ZnO thin films are deposited on glass substrates by spray pyrolysis using diethylzinc solution at a range from a room temperature to 150 °C while making N2 gas flow in atmospheric pressure. The morphology, the structural property, the density and the optical band gap are studied. As the deposition temperature is increasing, the overall density and the optical band gap approach to the values of ZnO single crystal. The quality of ZnO thin film deposited at 150 °C becomes near ZnO single crystal.

  16. Stabilizing laser energy density on a target during pulsed laser deposition of thin films

    Science.gov (United States)

    Dowden, Paul C.; Jia, Quanxi

    2016-05-31

    A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a "constant voltage" mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.

  17. Deposition of dielectric films on silicon using a fore-vacuum plasma electron source

    Energy Technology Data Exchange (ETDEWEB)

    Zolotukhin, D. B.; Tyunkov, A. V.; Yushkov, Yu. G., E-mail: yuyushkov@gmail.com [Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., Tomsk 634050 (Russian Federation); Oks, E. M. [Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., Tomsk 634050 (Russian Federation); Institute of High Current Electronics SB RAS, 2/3, Akademichesky Ave., Tomsk 634055 (Russian Federation)

    2016-06-15

    We describe an experiment on the use of a fore-vacuum-pressure, plasma-cathode, electron beam source with current up to 100 mA and beam energy up to 15 keV for deposition of Mg and Al oxide films on Si substrates in an oxygen atmosphere at a pressure of 10 Pa. The metals (Al and Mg) were evaporated and ionized using the electron beam with the formation of a gas-metal beam-plasma. The plasma was deposited on the surface of Si substrates. The elemental composition of the deposited films was analyzed.

  18. Perpendicular coercivity enhancement of CoPt/TiN films by nitrogen incorporation during deposition

    Science.gov (United States)

    An, Hongyu; Wang, Jian; Szivos, Janos; Harumoto, Takashi; Sannomiya, Takumi; Muraishi, Shinji; Safran, Gyorgy; Nakamura, Yoshio; Shi, Ji

    2015-11-01

    The effect of N incorporation on the structure and magnetic properties of CoPt thin films deposited on glass substrates with TiN seed layers has been investigated. During the deposition of CoPt, introducing 20% N2 into Ar atmosphere promotes the (001) texture and enhances the perpendicular coercivity of CoPt film compared with the film deposited in pure Ar and post-annealed under the same conditions. From the in situ x-ray diffraction results, it is confirmed that N incorporation expands the lattice parameter of CoPt, which favors the epitaxial growth of CoPt on TiN. During the post-annealing process, N releases from CoPt film and promotes the L10 ordering transformation of CoPt.

  19. Rectifying properties of ZnO thin films deposited on FTO by electrodeposition technique

    Science.gov (United States)

    Lv, Jianguo; Sun, Yue; Zhao, Min; Cao, Li; Xu, Jiayuan; He, Gang; Zhang, Miao; Sun, Zhaoqi

    2016-03-01

    ZnO thin films were successfully grown on fluorine-doped tin oxide glass by electrodeposition technique. The crystal structure, surface morphology and optical properties of the thin films were investigated. The average crystallite size and intensity of A1(LO) mode increase with improving the absolute value of deposition potential. The best preferential orientation along c-axis and the richest oxygen interstitial defects have been observed in the sample deposited at -0.8 V. A heterojunction device consisting of ZnO thin film and n-type fluorine-doped tin oxide was fabricated. The current-voltage (I-V) characteristic of the p-n heterojunction device deposited at -0.8 V shows the best rectifying diode behavior. The p-type conductivity of the ZnO thin film could be attributed to complex defect of unintentional impurity and interstitial oxygen.

  20. Silicon surface passivation using thin HfO2 films by atomic layer deposition

    Science.gov (United States)

    Gope, Jhuma; Vandana; Batra, Neha; Panigrahi, Jagannath; Singh, Rajbir; Maurya, K. K.; Srivastava, Ritu; Singh, P. K.

    2015-12-01

    Hafnium oxide (HfO2) is a potential material for equivalent oxide thickness (EOT) scaling in microelectronics; however, its surface passivation properties particularly on silicon are not well explored. This paper reports investigation on passivation properties of thermally deposited thin HfO2 films by atomic layer deposition system (ALD) on silicon surface. As-deposited pristine film (∼8 nm) shows better passivation with <100 cm/s surface recombination velocity (SRV) vis-à-vis thicker films. Further improvement in passivation quality is achieved with annealing at 400 °C for 10 min where the SRV reduces to ∼20 cm/s. Conductance measurements show that the interface defect density (Dit) increases with film thickness whereas its value decreases after annealing. XRR data corroborate with the observations made by FTIR and SRV data.