Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy

Energy Technology Data Exchange (ETDEWEB)

Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal, E-mail: kawal.sawhney@diamond.ac.uk [Diamond Light Source, Harwell Science and Innovation Campus, Didcot OX11 0DE (United Kingdom)

2016-05-15

X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or “tophat” beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicability in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.

Coherent double-color interference microscope for traceable optical surface metrology

Science.gov (United States)

Malinovski, I.; França, R. S.; Bessa, M. S.; Silva, C. R.; Couceiro, I. B.

2016-06-01

Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed.

Coherent double-color interference microscope for traceable optical surface metrology

International Nuclear Information System (INIS)

Malinovski, I; França, R S; Bessa, M S; Silva, C R; Couceiro, I B

2016-01-01

Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed. (paper)

Diffraction-based overlay metrology for double patterning technologies

Science.gov (United States)

Dasari, Prasad; Korlahalli, Rahul; Li, Jie; Smith, Nigel; Kritsun, Oleg; Volkman, Cathy

2009-03-01

The extension of optical lithography to 32nm and beyond is made possible by Double Patterning Techniques (DPT) at critical levels of the process flow. The ease of DPT implementation is hindered by increased significance of critical dimension uniformity and overlay errors. Diffraction-based overlay (DBO) has shown to be an effective metrology solution for accurate determination of the overlay errors associated with double patterning [1, 2] processes. In this paper we will report its use in litho-freeze-litho-etch (LFLE) and spacer double patterning technology (SDPT), which are pitch splitting solutions that reduce the significance of overlay errors. Since the control of overlay between various mask/level combinations is critical for fabrication, precise and accurate assessment of errors by advanced metrology techniques such as spectroscopic diffraction based overlay (DBO) and traditional image-based overlay (IBO) using advanced target designs will be reported. A comparison between DBO, IBO and CD-SEM measurements will be reported. . A discussion of TMU requirements for 32nm technology and TMU performance data of LFLE and SDPT targets by different overlay approaches will be presented.

Context-based virtual metrology

Science.gov (United States)

Ebersbach, Peter; Urbanowicz, Adam M.; Likhachev, Dmitriy; Hartig, Carsten; Shifrin, Michael

2018-03-01

Hybrid and data feed forward methodologies are well established for advanced optical process control solutions in highvolume semiconductor manufacturing. Appropriate information from previous measurements, transferred into advanced optical model(s) at following step(s), provides enhanced accuracy and exactness of the measured topographic (thicknesses, critical dimensions, etc.) and material parameters. In some cases, hybrid or feed-forward data are missed or invalid for dies or for a whole wafer. We focus on approaches of virtual metrology to re-create hybrid or feed-forward data inputs in high-volume manufacturing. We discuss missing data inputs reconstruction which is based on various interpolation and extrapolation schemes and uses information about wafer's process history. Moreover, we demonstrate data reconstruction approach based on machine learning techniques utilizing optical model and measured spectra. And finally, we investigate metrics that allow one to assess error margin of virtual data input.

Whispering gallery mode resonators for frequency metrology applications

Science.gov (United States)

Baumgartel, Lukas

This dissertation describes an investigation into the use of whispering gallery mode (WGM) resonators for applications towards frequency reference and metrology. Laser stabilization and the measurement of optical frequencies have enabled myriad technologies of both academic and commercial interest. A technology which seems to span both motivations is optical atomic clocks. These devices are virtually unimaginable without the ultra stable lasers plus frequency measurement and down-conversion afforded by Fabry Perot (FP) cavities and model-locked laser combs, respectively. However, WGM resonators can potentially perform both of these tasks while having the distinct advantages of compactness and simplicity. This work represents progress towards understanding and mitigating the performance limitations of WGM cavities for such applications. A system for laser frequency stabilization to a the cavity via the Pound-Drever-Hall (PDH) method is described. While the laser lock itself is found to perform at the level of several parts in 1015, a variety of fundamental and technical mechanisms destabilize the WGM frequency itself. Owing to the relatively large thermal expansion coefficients in optical crystals, environmental temperature drifts set the stability limit at time scales greater than the thermal relaxation time of the crystal. Uncompensated, these drifts pull WGM frequencies about 3 orders of magnitude more than they would in an FP cavity. Thus, two temperature compensation schemes are developed. An active scheme measures and stabilizes the mode volume temperature to the level of several nK, reducing the effective temperature coefficient of the resonator to 1.7x10-7 K-1; simulations suggest that the value could eventually be as low as 3.5x10-8 K-1, on par with the aforementioned FP cavities. A second, passive scheme is also described, which employs a heterogeneous resonator structure that capitalizes on the thermo-mechanical properties of one material and the optical

Introduction to quantum metrology quantum standards and instrumentation

CERN Document Server

Nawrocki, Waldemar

2015-01-01

This book presents the theory of quantum effects used in metrology and results of the author’s own research in the field of quantum electronics. The book provides also quantum measurement standards used in many branches of metrology for electrical quantities, mass, length, time and frequency. This book represents the first comprehensive survey of quantum metrology problems. As a scientific survey, it propagates a new approach to metrology with more emphasis on its connection with physics. This is of importance for the constantly developing technologies and nanotechnologies in particular. Providing a presentation of practical applications of the effects used in quantum metrology for the construction of quantum standards and sensitive electronic components, the book is useful for a wide audience of physicists and metrologists in the broad sense of both terms. In 2014 a new system of units, the so called  Quantum SI, is introduced. This book helps to understand and approve the new system to both technology a...

UPWIND 1A2 Metrology. Final Report

DEFF Research Database (Denmark)

Eecen, P.J.; Wagenaar, J.W.; Stefanatos, N.

. Since this problem covers many areas of wind energy, the work package is defined as a crosscutting activity. The objectives of the metrology work package are to develop metrology tools in wind energy to significantly enhance the quality of measurement and testing techniques. The first deliverable...... is a valuable tool for the further assessment and interest has been shown from other work packages, such as Training. This report describes the activities that have been carried out in the Work Package 1A2 Metrology of the UpWind project. Activities from Risø are described in a separate report: T.F. Pedersen...... was to perform a state of the art assessment to identify all relevant measurands. The required accuracies and required sampling frequencies have been identified from the perspective of the users of the data (the other work packages in UpWind). This work led to the definition of the Metrology Database, which...

Refractive-index-sensing radio-frequency comb with intracavity multi-mode interference fibre sensor

OpenAIRE

Oe, Roy; Taue, Shuji; Minamikawa, Takeo; Nagai, Kosuke; Mizutani, Yasuhiro; Iwata, Tetsuo; Yamamoto, Hirotsugu; Fukano, Hideki; Nakajima, Yoshiaki; Minoshima, Kaoru; Yasui, Takeshi

2018-01-01

Optical frequency combs have attracted attention as optical frequency rulers due to their tooth-like discrete spectra together with their inherent mode-locking nature and phase-locking control to a frequency standard. Based on this concept, their applications until now have been demonstrated in the fields of optical frequency metrology and optical distance metrology. However, if the utility of optical combs can be further expanded beyond their optical-frequency-ruler-based application by expl...

Phase-locking to a free-space terahertz comb for metrological-grade terahertz lasers.

Science.gov (United States)

Consolino, L; Taschin, A; Bartolini, P; Bartalini, S; Cancio, P; Tredicucci, A; Beere, H E; Ritchie, D A; Torre, R; Vitiello, M S; De Natale, P

2012-01-01

Optical frequency comb synthesizers have represented a revolutionary approach to frequency metrology, providing a grid of frequency references for any laser emitting within their spectral coverage. Extending the metrological features of optical frequency comb synthesizers to the terahertz domain would be a major breakthrough, due to the widespread range of accessible strategic applications and the availability of stable, high-power and widely tunable sources such as quantum cascade lasers. Here we demonstrate phase-locking of a 2.5 THz quantum cascade laser to a free-space comb, generated in a LiNbO(3) waveguide and covering the 0.1-6 THz frequency range. We show that even a small fraction (quantum cascade laser is sufficient to generate a beat note suitable for phase-locking to the comb, paving the way to novel metrological-grade terahertz applications, including high-resolution spectroscopy, manipulation of cold molecules, astronomy and telecommunications.

Frequency metrology on the 4s(2)S(1/2)-4p(2)P(1/2) transition in Ca-40(+) for a comparison with quasar data

NARCIS (Netherlands)

Wolf, A.L.; van den Berg, S.A.; Gohle, C.; Salumbides, E.J.; Ubachs, W.M.G.; Eikema, K.S.E.

2008-01-01

High accuracy frequency metrology on the 4s S 12 2 -4p P 12 2 transition in calcium ions is performed using laser cooled and crystallized ions in a linear Paul trap. Calibration is performed with a frequency comb laser, resulting in a transition frequency of f=755 222 766.2 (1.7) MHz. The accuracy

Remote Metrology, Mapping, and Motion Sensing of Plasma Facing Components Using FM Coherent Laser Radar

International Nuclear Information System (INIS)

Menon, M.M.; Barry, R.E.; Slotwinsky, A.; Kugel, H.W.; Skinner, C.H.

2000-01-01

Metrology inside a D/T burning fusion reactor must necessarily be conducted remotely since the in-vessel environment would be highly radioactive due to neutron activation of the torus walls. A technique based on frequency modulated coherent laser radar (FM CLR) for such remote metrology is described. Since the FM CLR relies on frequency shift to measure distances, the results are largely insensitive to surface reflectance characteristics. Results of measurements in TFTR and NSTX fusion devices using a prototype FM CLR unit, capable of remotely measuring distances (range) up to 22 m with better than 0.1-mm precision, are provided. These results illustrate that the FM CLR can be used for precision remote metrology as well as viewing. It is also shown that by conducting Doppler corrected range measurements using the CLR, the motion of objects can be tracked. Thus, the FM CLR has the potential to remotely measure the motion of plasma facing components (PFCs) during plasma disruptions

Metrology of human-based and other qualitative measurements

Science.gov (United States)

Pendrill, Leslie; Petersson, Niclas

2016-09-01

The metrology of human-based and other qualitative measurements is in its infancy—concepts such as traceability and uncertainty are as yet poorly developed. This paper reviews how a measurement system analysis approach, particularly invoking as performance metric the ability of a probe (such as a human being) acting as a measurement instrument to make a successful decision, can enable a more general metrological treatment of qualitative observations. Measures based on human observations are typically qualitative, not only in sectors, such as health care, services and safety, where the human factor is obvious, but also in customer perception of traditional products of all kinds. A principal challenge is that the usual tools of statistics normally employed for expressing measurement accuracy and uncertainty will probably not work reliably if relations between distances on different portions of scales are not fully known, as is typical of ordinal or other qualitative measurements. A key enabling insight is to connect the treatment of decision risks associated with measurement uncertainty to generalized linear modelling (GLM). Handling qualitative observations in this way unites information theory, the perceptive identification and choice paradigms of psychophysics. The Rasch invariant measure psychometric GLM approach in particular enables a proper treatment of ordinal data; a clear separation of probe and item attribute estimates; simple expressions for instrument sensitivity; etc. Examples include two aspects of the care of breast cancer patients, from diagnosis to rehabilitation. The Rasch approach leads in turn to opportunities of establishing metrological references for quality assurance of qualitative measurements. In psychometrics, one could imagine a certified reference for knowledge challenge, for example, a particular concept in understanding physics or for product quality of a certain health care service. Multivariate methods, such as Principal Component

Metrology of human-based and other qualitative measurements

International Nuclear Information System (INIS)

Pendrill, Leslie; Petersson, Niclas

2016-01-01

The metrology of human-based and other qualitative measurements is in its infancy—concepts such as traceability and uncertainty are as yet poorly developed. This paper reviews how a measurement system analysis approach, particularly invoking as performance metric the ability of a probe (such as a human being) acting as a measurement instrument to make a successful decision, can enable a more general metrological treatment of qualitative observations. Measures based on human observations are typically qualitative, not only in sectors, such as health care, services and safety, where the human factor is obvious, but also in customer perception of traditional products of all kinds. A principal challenge is that the usual tools of statistics normally employed for expressing measurement accuracy and uncertainty will probably not work reliably if relations between distances on different portions of scales are not fully known, as is typical of ordinal or other qualitative measurements. A key enabling insight is to connect the treatment of decision risks associated with measurement uncertainty to generalized linear modelling (GLM). Handling qualitative observations in this way unites information theory, the perceptive identification and choice paradigms of psychophysics. The Rasch invariant measure psychometric GLM approach in particular enables a proper treatment of ordinal data; a clear separation of probe and item attribute estimates; simple expressions for instrument sensitivity; etc. Examples include two aspects of the care of breast cancer patients, from diagnosis to rehabilitation. The Rasch approach leads in turn to opportunities of establishing metrological references for quality assurance of qualitative measurements. In psychometrics, one could imagine a certified reference for knowledge challenge, for example, a particular concept in understanding physics or for product quality of a certain health care service. Multivariate methods, such as Principal Component

An OCD perspective of line edge and line width roughness metrology

Science.gov (United States)

Bonam, Ravi; Muthinti, Raja; Breton, Mary; Liu, Chi-Chun; Sieg, Stuart; Seshadri, Indira; Saulnier, Nicole; Shearer, Jeffrey; Patlolla, Raghuveer; Huang, Huai

2017-03-01

Metrology of nanoscale patterns poses multiple challenges that range from measurement noise, metrology errors, probe size etc. Optical Metrology has gained a lot of significance in the semiconductor industry due to its fast turn around and reliable accuracy, particularly to monitor in-line process variations. Apart from monitoring critical dimension, thickness of films, there are multiple parameters that can be extracted from Optical Metrology models3. Sidewall angles, material compositions etc., can also be modeled to acceptable accuracy. Line edge and Line Width roughness are much sought of metrology following critical dimension and its uniformity, although there has not been much development in them with optical metrology. Scanning Electron Microscopy is still used as a standard metrology technique for assessment of Line Edge and Line Width roughness. In this work we present an assessment of Optical Metrology and its ability to model roughness from a set of structures with intentional jogs to simulate both Line edge and Line width roughness at multiple amplitudes and frequencies. We also present multiple models to represent roughness and extract relevant parameters from Optical metrology. Another critical aspect of optical metrology setup is correlation of measurement to a complementary technique to calibrate models. In this work, we also present comparison of roughness parameters extracted and measured with variation of image processing conditions on a commercially available CD-SEM tool.

Quantum interference metrology at deep-UV wavelengths using phase-controlled ultrashort laser pulses

NARCIS (Netherlands)

Zinkstok, R. Th; Witte, S.; Ubachs, W.; Hogervorst, W.; Eikema, K. S E

2005-01-01

High-resolution metrology at wavelengths shorter than ultraviolet is in general hampered by a limited availability of appropriate laser sources. It is demonstrated that this limitation can be overcome by quantum-interference metrology with frequency up-converted ultrafast laser pulses. The required

Enhanced resolution and accuracy of freeform metrology through Subaperture Stitching Interferometry

Science.gov (United States)

Supranowitz, Chris; Maloney, Chris; Murphy, Paul; Dumas, Paul

2017-10-01

Recent advances in polishing and metrology have addressed many of the challenges in the fabrication and metrology of freeform surfaces, and the manufacture of these surfaces is possible today. However, achieving the form and mid-spatial frequency (MSF) specifications that are typical of visible imaging systems remains a challenge. Interferometric metrology for freeform surfaces is thus highly desirable for such applications, but the capability is currently quite limited for freeforms. In this paper, we provide preliminary results that demonstrate accurate, high-resolution measurements of freeform surfaces using prototype software on QED's ASI™ (Aspheric Stitching Interferometer).

Advanced applications of scatterometry based optical metrology

Science.gov (United States)

Dixit, Dhairya; Keller, Nick; Kagalwala, Taher; Recchia, Fiona; Lifshitz, Yevgeny; Elia, Alexander; Todi, Vinit; Fronheiser, Jody; Vaid, Alok

2017-03-01

The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, and lower cost per transistor. These developments in the field of semiconductor manufacturing along with the overall minimization of the size of transistors require continuous development of metrology tools used for characterization of these complex 3D device architectures. Optical scatterometry or optical critical dimension (OCD) is one of the most prevalent inline metrology techniques in semiconductor manufacturing because it is a quick, precise and non-destructive metrology technique. However, at present OCD is predominantly used to measure the feature dimensions such as line-width, height, side-wall angle, etc. of the patterned nano structures. Use of optical scatterometry for characterizing defects such as pitch-walking, overlay, line edge roughness, etc. is fairly limited. Inspection of process induced abnormalities is a fundamental part of process yield improvement. It provides process engineers with important information about process errors, and consequently helps optimize materials and process parameters. Scatterometry is an averaging technique and extending it to measure the position of local process induced defectivity and feature-to-feature variation is extremely challenging. This report is an overview of applications and benefits of using optical scatterometry for characterizing defects such as pitch-walking, overlay and fin bending for advanced technology nodes beyond 7nm. Currently, the optical scatterometry is based on conventional spectroscopic ellipsometry and spectroscopic reflectometry measurements, but generalized ellipsometry or Mueller matrix spectroscopic ellipsometry data provides important, additional information about complex structures that exhibit anisotropy and depolarization effects. In addition the symmetry-antisymmetry properties associated with Mueller matrix (MM) elements

Theory-based metrological traceability in education: A reading measurement network.

Science.gov (United States)

Fisher, William P; Stenner, A Jackson

2016-10-01

Huge resources are invested in metrology and standards in the natural sciences, engineering, and across a wide range of commercial technologies. Significant positive returns of human, social, environmental, and economic value on these investments have been sustained for decades. Proven methods for calibrating test and survey instruments in linear units are readily available, as are data- and theory-based methods for equating those instruments to a shared unit. Using these methods, metrological traceability is obtained in a variety of commercially available elementary and secondary English and Spanish language reading education programs in the U.S., Canada, Mexico, and Australia. Given established historical patterns, widespread routine reproduction of predicted text-based and instructional effects expressed in a common language and shared frame of reference may lead to significant developments in theory and practice. Opportunities for systematic implementations of teacher-driven lean thinking and continuous quality improvement methods may be of particular interest and value.

Mathematical calibration procedure of a capacitive sensor-based indexed metrology platform

International Nuclear Information System (INIS)

Brau-Avila, A; Valenzuela-Galvan, M; Herrera-Jimenez, V M; Santolaria, J; Aguilar, J J; Acero, R

2017-01-01

The demand for faster and more reliable measuring tasks for the control and quality assurance of modern production systems has created new challenges for the field of coordinate metrology. Thus, the search for new solutions in coordinate metrology systems and the need for the development of existing ones still persists. One example of such a system is the portable coordinate measuring machine (PCMM), the use of which in industry has considerably increased in recent years, mostly due to its flexibility for accomplishing in-line measuring tasks as well as its reduced cost and operational advantages compared to traditional coordinate measuring machines. Nevertheless, PCMMs have a significant drawback derived from the techniques applied in the verification and optimization procedures of their kinematic parameters. These techniques are based on the capture of data with the measuring instrument from a calibrated gauge object, fixed successively in various positions so that most of the instrument measuring volume is covered, which results in time-consuming, tedious and expensive verification and optimization procedures. In this work the mathematical calibration procedure of a capacitive sensor-based indexed metrology platform (IMP) is presented. This calibration procedure is based on the readings and geometric features of six capacitive sensors and their targets with nanometer resolution. The final goal of the IMP calibration procedure is to optimize the geometric features of the capacitive sensors and their targets in order to use the optimized data in the verification procedures of PCMMs. (paper)

Mathematical calibration procedure of a capacitive sensor-based indexed metrology platform

Science.gov (United States)

Brau-Avila, A.; Santolaria, J.; Acero, R.; Valenzuela-Galvan, M.; Herrera-Jimenez, V. M.; Aguilar, J. J.

2017-03-01

The demand for faster and more reliable measuring tasks for the control and quality assurance of modern production systems has created new challenges for the field of coordinate metrology. Thus, the search for new solutions in coordinate metrology systems and the need for the development of existing ones still persists. One example of such a system is the portable coordinate measuring machine (PCMM), the use of which in industry has considerably increased in recent years, mostly due to its flexibility for accomplishing in-line measuring tasks as well as its reduced cost and operational advantages compared to traditional coordinate measuring machines. Nevertheless, PCMMs have a significant drawback derived from the techniques applied in the verification and optimization procedures of their kinematic parameters. These techniques are based on the capture of data with the measuring instrument from a calibrated gauge object, fixed successively in various positions so that most of the instrument measuring volume is covered, which results in time-consuming, tedious and expensive verification and optimization procedures. In this work the mathematical calibration procedure of a capacitive sensor-based indexed metrology platform (IMP) is presented. This calibration procedure is based on the readings and geometric features of six capacitive sensors and their targets with nanometer resolution. The final goal of the IMP calibration procedure is to optimize the geometric features of the capacitive sensors and their targets in order to use the optimized data in the verification procedures of PCMMs.

The quality of measurements a metrological reference

CERN Document Server

Fridman, A E

2012-01-01

This book provides a detailed discussion and commentary on the fundamentals of metrology. The fundamentals of metrology, the principles underlying the design of the SI International System of units, the theory of measurement error, a new methodology for estimation of measurement accuracy based on uncertainty, and methods for reduction of measured results and estimation of measurement uncertainty are all discussed from a modern point of view. The concept of uncertainty is shown to be consistent with the classical theory of accuracy. The theory of random measurement errors is supplemented by a very general description based on the generalized normal distribution; systematic instrumental error is described in terms of a methodology for normalizing the metrological characteristics of measuring instruments. A new international system for assuring uniformity of measurements based on agreements between national metrological institutes is discussed, in addition to the role and procedure for performance of key compari...

Laser source for dimensional metrology: investigation of an iodine stabilized system based on narrow linewidth 633 nm DBR diode

Czech Academy of Sciences Publication Activity Database

Řeřucha, Šimon; Yacoot, A.; Pham, Minh Tuan; Čížek, Martin; Hucl, Václav; Lazar, Josef; Číp, Ondřej

2017-01-01

Roč. 28, č. 4 (2017), s. 1-11, č. článku 045204. ISSN 0957-0233 R&D Projects: GA ČR GB14-36681G; GA MŠk(CZ) LO1212; GA MŠk ED0017/01/01; GA TA ČR TE01020233 Institutional support: RVO:68081731 Keywords : optical metrology * DBR laser diode * frequency stabilization * laser interferometry * dimensional metrology * iodine stabilization * displacement measurement Subject RIV: BH - Optics, Masers, Lasers OBOR OECD: Optics (including laser optics and quantum optics) Impact factor: 1.585, year: 2016

Elements for successful sensor-based process control {Integrated Metrology}

International Nuclear Information System (INIS)

Butler, Stephanie Watts

1998-01-01

Current productivity needs have stimulated development of alternative metrology, control, and equipment maintenance methods. Specifically, sensor applications provide the opportunity to increase productivity, tighten control, reduce scrap, and improve maintenance schedules and procedures. Past experience indicates a complete integrated solution must be provided for sensor-based control to be used successfully in production. In this paper, Integrated Metrology is proposed as the term for an integrated solution that will result in a successful application of sensors for process control. This paper defines and explores the perceived four elements of successful sensor applications: business needs, integration, components, and form. Based upon analysis of existing successful commercially available controllers, the necessary business factors have been determined to be strong, measurable industry-wide business needs whose solution is profitable and feasible. This paper examines why the key aspect of integration is the decision making process. A detailed discussion is provided of the components of most importance to sensor based control: decision-making methods, the 3R's of sensors, and connectivity. A metric for one of the R's (resolution) is proposed to allow focus on this important aspect of measurement. A form for these integrated components which synergistically partitions various aspects of control at the equipment and MES levels to efficiently achieve desired benefits is recommended

Elements for successful sensor-based process control {Integrated Metrology}

Science.gov (United States)

Butler, Stephanie Watts

1998-11-01

Current productivity needs have stimulated development of alternative metrology, control, and equipment maintenance methods. Specifically, sensor applications provide the opportunity to increase productivity, tighten control, reduce scrap, and improve maintenance schedules and procedures. Past experience indicates a complete integrated solution must be provided for sensor-based control to be used successfully in production. In this paper, Integrated Metrology is proposed as the term for an integrated solution that will result in a successful application of sensors for process control. This paper defines and explores the perceived four elements of successful sensor applications: business needs, integration, components, and form. Based upon analysis of existing successful commercially available controllers, the necessary business factors have been determined to be strong, measurable industry-wide business needs whose solution is profitable and feasible. This paper examines why the key aspect of integration is the decision making process. A detailed discussion is provided of the components of most importance to sensor based control: decision-making methods, the 3R's of sensors, and connectivity. A metric for one of the R's (resolution) is proposed to allow focus on this important aspect of measurement. A form for these integrated components which synergistically partitions various aspects of control at the equipment and MES levels to efficiently achieve desired benefits is recommended.

Mirror surface metrology and polishing for AXAF/TMA

International Nuclear Information System (INIS)

Slomba, A.; Babish, R.; Glenn, P.

1985-01-01

The achievement of the derived goals for mirror surface quality on the Advanced X-ray Astrophysics Facility (AXAF), Technology Mirror Assembly (TMA) required a combination of state-of-the-art metrology and polishing techniques. In this paper, the authors summarize the derived goals and cover the main facets of the various metrology instruments employed, as well as the philosophy and technique used in the polishing work. In addition, they show how progress was measured against the goals, using the detailed error budget for surface errors and a mathematical model for performance prediction. The metrology instruments represented a considerable advance on the state-of-the-art and fully satisfied the error budget goals for the various surface errors. They were capable of measuring the surface errors over a large range of spatial periods, from low-frequency figure errors to microroughness. The polishing was accomplished with a computer-controlled process, guided by the combined data from various metrology instruments. This process was also tailored to reduce the surface errors over the full range of spatial periods

Optical metrology for advanced process control: full module metrology solutions

Science.gov (United States)

Bozdog, Cornel; Turovets, Igor

2016-03-01

Optical metrology is the workhorse metrology in manufacturing and key enabler to patterning process control. Recent advances in device architecture are gradually shifting the need for process control from the lithography module to other patterning processes (etch, trim, clean, LER/LWR treatments, etc..). Complex multi-patterning integration solutions, where the final pattern is the result of multiple process steps require a step-by-step holistic process control and a uniformly accurate holistic metrology solution for pattern transfer for the entire module. For effective process control, more process "knobs" are needed, and a tighter integration of metrology with process architecture.

Metrological management evaluation based on ISO10012: an empirical study in ISO-14001-certified Spanish companies

International Nuclear Information System (INIS)

Beltran, Jaime; Rivas, Miguel; Munuzuri, Jesus; Gonzalez, Cristina

2010-01-01

Environmental management systems based on the ISO 14001 standard rely strongly on metrological measurement and confirmation processes to certify the extent to which organizations monitor and improve their environmental behavior. Nevertheless, the literature lacks in studies that assess the influence of these metrological processes on the performance of environmental management in organizations, even now that the international standard ISO 10012 is already available to establish requisites and guidelines for the development of a metrological management system that is compatible with any other standardized management system. This work seeks to assess that influence through the development of an evaluation model for metrological management, which is then validated through an experimental analysis of the results obtained from the application of an audit process in 11 Spanish companies, all ISO-14001-certified and operating in different industrial sectors. (author)

Experimental realization of the quantum metrological triangle experiment

Energy Technology Data Exchange (ETDEWEB)

Chenaud, B; Devoille, L; Steck, B; Feltin, N; Gonzalez-Cano, A; Poirier, W; Schopfer, F; Spengler, G; Djordjevic, S; Seron, O; Piquemal, F [Laboratoire national de metrologie et d' essais (LNE), Trappes (France); Lotkhov, S [Physikalisch-Technische Bundesanstalt (PTB), Braunschweig (Germany)], E-mail: laurent.devoille@lne.fr

2009-02-01

The quantum metrological triangle experiment (QMTE) consists in realizing Ohm's law with Josephson (JE), quantum Hall (QHE) and single electron tunneling (SET) effects. The aim is to check the consistency of the link among the phenomenological constants K {sub J}, R{sub K} and Q {sub X} involved in these effects and theoretically expressed with the fundamental constants e and h. Such an experiment could be a contribution for a new definition of the systeme international d'unites (SI) base units. In the QMTE, a current generated by a SET device flows through a resistor calibrated against QHE standard and the voltage induced at its terminals is compared to the metrological voltage generated by a Josephson junctions array. At LNE, the studied SET devices are 3 junctions single electron pumps with on chip resistors. The quantized current generated by this pump is theoretically equal to ef (f is the frequency of the driving signals applied on the gates) and is measured through a cryogenic current comparator (CCC), which allows to amplify the low pumping current with a metrological accuracy. We will present and discuss the experimental set-up developed at LNE and the first results. In addition to the main aim of QMTE described above, these preliminary results are also a first step towards a determination of e.

7th International Workshop on Advanced Optical Imaging and Metrology

CERN Document Server

2014-01-01

In continuation of the FRINGE Workshop Series this Proceeding contains all contributions presented at the 7. International Workshop on Advanced Optical Imaging and Metrology. The FRINGE Workshop Series is dedicated to the presentation, discussion and dissemination of recent results in Optical Imaging and Metrology. Topics of particular interest for the 7. Workshop are: - New methods and tools for the generation, acquisition, processing, and evaluation of data in Optical Imaging and Metrology (digital wavefront engineering, computational imaging, model-based reconstruction, compressed sensing, inverse problems solution) - Application-driven technologies in Optical Imaging and Metrology (high-resolution, adaptive, active, robust, reliable, flexible, in-line, real-time) - High-dynamic range solutions in Optical Imaging and Metrology (from macro to nano) - Hybrid technologies in Optical Imaging and Metrology (hybrid optics, sensor and data fusion, model-based solutions, multimodality) - New optical sensors, imagi...

Metrology/viewing system for next generation fusion reactors

International Nuclear Information System (INIS)

Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Menon, M.M.; Dagher, M.A.

1997-01-01

Next generation fusion reactors require accurate measuring systems to verify sub-millimeter alignment of plasma-facing components in the reactor vessel. A metrology system capable of achieving such accuracy must be compatible with the vessel environment of high gamma radiation, high vacuum, elevated temperature, and magnetic field. This environment requires that the system must be remotely deployed. A coherent, frequency modulated laser radar system is being integrated with a remotely operated deployment system to meet these requirements. The metrology/viewing system consists of a compact laser transceiver optics module which is linked through fiber optics to the laser source and imaging units that are located outside of the harsh environment. The deployment mechanism is a telescopic-mast positioning system. This paper identifies the requirements for the International Thermonuclear Experimental Reactor metrology and viewing system, and describes a remotely operated precision ranging and surface mapping system

Spectral purity and tunability of terahertz quantum cascade laser sources based on intracavity difference-frequency generation.

Science.gov (United States)

Consolino, Luigi; Jung, Seungyong; Campa, Annamaria; De Regis, Michele; Pal, Shovon; Kim, Jae Hyun; Fujita, Kazuue; Ito, Akio; Hitaka, Masahiro; Bartalini, Saverio; De Natale, Paolo; Belkin, Mikhail A; Vitiello, Miriam Serena

2017-09-01

Terahertz sources based on intracavity difference-frequency generation in mid-infrared quantum cascade lasers (THz DFG-QCLs) have recently emerged as the first monolithic electrically pumped semiconductor sources capable of operating at room temperature across the 1- to 6-THz range. Despite tremendous progress in power output, which now exceeds 1 mW in pulsed and 10 μW in continuous-wave regimes at room temperature, knowledge of the major figure of merits of these devices for high-precision spectroscopy, such as spectral purity and absolute frequency tunability, is still lacking. By exploiting a metrological grade system comprising a terahertz frequency comb synthesizer, we measure, for the first time, the free-running emission linewidth (LW), the tuning characteristics, and the absolute center frequency of individual emission lines of these sources with an uncertainty of 4 × 10 -10 . The unveiled emission LW (400 kHz at 1-ms integration time) indicates that DFG-QCLs are well suited to operate as local oscillators and to be used for a variety of metrological, spectroscopic, communication, and imaging applications that require narrow-LW THz sources.

Face-based recognition techniques: proposals for the metrological characterization of global and feature-based approaches

Science.gov (United States)

Betta, G.; Capriglione, D.; Crenna, F.; Rossi, G. B.; Gasparetto, M.; Zappa, E.; Liguori, C.; Paolillo, A.

2011-12-01

Security systems based on face recognition through video surveillance systems deserve great interest. Their use is important in several areas including airport security, identification of individuals and access control to critical areas. These systems are based either on the measurement of details of a human face or on a global approach whereby faces are considered as a whole. The recognition is then performed by comparing the measured parameters with reference values stored in a database. The result of this comparison is not deterministic because measurement results are affected by uncertainty due to random variations and/or to systematic effects. In these circumstances the recognition of a face is subject to the risk of a faulty decision. Therefore, a proper metrological characterization is needed to improve the performance of such systems. Suitable methods are proposed for a quantitative metrological characterization of face measurement systems, on which recognition procedures are based. The proposed methods are applied to three different algorithms based either on linear discrimination, on eigenface analysis, or on feature detection.

Face-based recognition techniques: proposals for the metrological characterization of global and feature-based approaches

International Nuclear Information System (INIS)

Betta, G; Capriglione, D; Crenna, F; Rossi, G B; Gasparetto, M; Zappa, E; Liguori, C; Paolillo, A

2011-01-01

Security systems based on face recognition through video surveillance systems deserve great interest. Their use is important in several areas including airport security, identification of individuals and access control to critical areas. These systems are based either on the measurement of details of a human face or on a global approach whereby faces are considered as a whole. The recognition is then performed by comparing the measured parameters with reference values stored in a database. The result of this comparison is not deterministic because measurement results are affected by uncertainty due to random variations and/or to systematic effects. In these circumstances the recognition of a face is subject to the risk of a faulty decision. Therefore, a proper metrological characterization is needed to improve the performance of such systems. Suitable methods are proposed for a quantitative metrological characterization of face measurement systems, on which recognition procedures are based. The proposed methods are applied to three different algorithms based either on linear discrimination, on eigenface analysis, or on feature detection

Optical vortex metrology for non-destructive testing

DEFF Research Database (Denmark)

Wang, W.; Hanson, Steen Grüner

2009-01-01

Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis.......Based on the phase singularities in optical fields, we introduce a new technique, referred to as Optical Vortex Metrology, and demonstrate its application to nano- displacement, flow measurements and biological kinematic analysis....

Nanoelectronics: Metrology and Computation

International Nuclear Information System (INIS)

Lundstrom, Mark; Clark, Jason V.; Klimeck, Gerhard; Raman, Arvind

2007-01-01

Research in nanoelectronics poses new challenges for metrology, but advances in theory, simulation and computing and networking technology provide new opportunities to couple simulation and metrology. This paper begins with a brief overview of current work in computational nanoelectronics. Three examples of how computation can assist metrology will then be discussed. The paper concludes with a discussion of how cyberinfrastructure can help connect computing and metrology using the nanoHUB (www.nanoHUB.org) as a specific example

Metrology Measurement Capabilities

Energy Technology Data Exchange (ETDEWEB)

Dr. Glen E. Gronniger

2007-10-02

This document contains descriptions of Federal Manufacturing & Technologies (FM&T) Metrology capabilities, traceability flow charts, and the measurement uncertainty of each measurement capability. Metrology provides NIST traceable precision measurements or equipment calibration for a wide variety of parameters, ranges, and state-of-the-art uncertainties. Metrology laboratories conform to the requirements of the Department of Energy Development and Production Manual Chapter 13.2, ANSI/ISO/IEC ANSI/ISO/IEC 17025:2005, and ANSI/NCSL Z540-1. FM&T Metrology laboratories are accredited by NVLAP for the parameters, ranges, and uncertainties listed in the specific scope of accreditation under NVLAP Lab code 200108-0. See the Internet at http://ts.nist.gov/Standards/scopes/2001080.pdf. These parameters are summarized. The Honeywell Federal Manufacturing & Technologies (FM&T) Metrology Department has developed measurement technology and calibration capability in four major fields of measurement: (1) Mechanical; (2) Environmental, Gas, Liquid; (3) Electrical (DC, AC, RF/Microwave); and (4) Optical and Radiation. Metrology Engineering provides the expertise to develop measurement capabilities for virtually any type of measurement in the fields listed above. A strong audit function has been developed to provide a means to evaluate the calibration programs of our suppliers and internal calibration organizations. Evaluation includes measurement audits and technical surveys.

An alternative method to achieve metrological confirmation in measurement process

Science.gov (United States)

Villeta, M.; Rubio, E. M.; Sanz, A.; Sevilla, L.

2012-04-01

Metrological confirmation process must be designed and implemented to ensure that metrological characteristics of the measurement system meet metrological requirements of the measurement process. The aim of this paper is to present an alternative method to the traditional metrological requirements about the relationship between tolerance and measurement uncertainty, to develop such confirmation processes. The proposed way to metrological confirmation considers a given inspection task of the measurement process into the manufacturing system, and it is based on the Index of Contamination of the Capability, ICC. Metrological confirmation process is then developed taking into account the producer risks and economic considerations on this index. As a consequence, depending on the capability of the manufacturing process, the measurement system will be or will not be in adequate state of metrological confirmation for the measurement process.

Speckle-based portable device for in-situ metrology of x-ray mirrors at Diamond Light Source

Science.gov (United States)

Wang, Hongchang; Kashyap, Yogesh; Zhou, Tunhe; Sawhney, Kawal

2017-09-01

For modern synchrotron light sources, the push toward diffraction-limited and coherence-preserved beams demands accurate metrology on X-ray optics. Moreover, it is important to perform in-situ characterization and optimization of X-ray mirrors since their ultimate performance is critically dependent on the working conditions. Therefore, it is highly desirable to develop a portable metrology device, which can be easily implemented on a range of beamlines for in-situ metrology. An X-ray speckle-based portable device for in-situ metrology of synchrotron X-ray mirrors has been developed at Diamond Light Source. Ultra-high angular sensitivity is achieved by scanning the speckle generator in the X-ray beam. In addition to the compact setup and ease of implementation, a user-friendly graphical user interface has been developed to ensure that characterization and alignment of X-ray mirrors is simple and fast. The functionality and feasibility of this device is presented with representative examples.

Metrological-grade tunable coherent source in the mid-infrared for molecular precision spectroscopy

Science.gov (United States)

Insero, G.; Clivati, C.; D'Ambrosio, D.; Cancio Pastor, P.; Verde, M.; Schunemann, P. G.; Zondy, J.-J.; Inguscio, M.; Calonico, D.; Levi, F.; De Natale, P.; Santambrogio, G.; Borri, S.

2018-02-01

We report on a metrological-grade mid-IR source with a 10-14 short-term instability for high-precision spectroscopy. Our source is based on the combination of a quantum cascade laser and a coherent radiation obtained by difference-frequency generation in an orientation-patterned gallium phosphide (OP-GaP) crystal. The pump and signal lasers are locked to an optical frequency comb referenced to the primary frequency standard via an optical fiber link. We demonstrate the robustness of the apparatus by measuring a vibrational transition around 6 μm on a metastable state of CO molecuels with 11 digits of precision.

Impact of the ITRS Metrology Roadmap

International Nuclear Information System (INIS)

Diebold, Alain C.

2001-01-01

The International Technology Roadmap for Semiconductors (ITRS) provides the semiconductor industry with the timing of critical technology needs for future generations of integrated circuits. The Metrology roadmap in the ITRS describes the measurement needs based on the process requirements found in the Lithography, Front End Processes, Interconnect, and Packaging Roadmaps. This paper illustrates the impact of the Metrology Roadmap on the development of key measurement technology

Capability Handbook- offline metrology

DEFF Research Database (Denmark)

Islam, Aminul; Marhöfer, David Maximilian; Tosello, Guido

This offline metrological capability handbook has been made in relation to HiMicro Task 3.3. The purpose of this document is to assess the metrological capability of the HiMicro partners and to gather the information of all available metrological instruments in the one single document. It provides...

Adhesive Bonding for Optical Metrology Systems in Space Applications

International Nuclear Information System (INIS)

Gohlke, Martin; Schuldt, Thilo; Braxmaier, Claus; Döringshoff, Klaus; Peters, Achim; Johann, Ulrich; Weise, Dennis

2015-01-01

Laser based metrology systems become more and more attractive for space applications and are the core elements of planned missions such as LISA (NGO, eLISA) or NGGM where laser interferometry is used for distance measurements between satellites. The GRACE-FO mission will for the first time demonstrate a Laser Ranging Instrument (LRI) in space, starting 2017. Laser based metrology also includes optical clocks/references, either as ultra-stable light source for high sensitivity interferometry or as scientific payload e.g. proposed in fundamental physics missions such as mSTAR (mini SpaceTime Asymmetry Research), a mission dedicated to perform a Kennedy-Thorndike experiment on a satellite in a low-Earth orbit. To enable the use of existing optical laboratory setups, optimization with respect to power consumption, weight and dimensions is necessary. At the same time the thermal and structural stability must be increased. Over the last few years we investigated adhesive bonding of optical components to thermally highly stable glass ceramics as an easy-to-handle assembly integration technology. Several setups were implemented and tested for potential later use in space applications. We realized a heterodyne LISA related interferometer with demonstrated noise levels in the pm-range for translation measurement and nano-radiant-range for tilt measurements and two iodine frequency references on Elegant Breadboard (EBB) and Engineering Model (EM) level with frequency stabilities in the 10 -15 range for longer integration times. The EM setup was thermally cycled and vibration tested. (paper)

Differential Evolution for Many-Particle Adaptive Quantum Metrology

NARCIS (Netherlands)

Lovett, N.B.; Crosnier, C.; Perarnau- Llobet, M.; Sanders, B.

2013-01-01

We devise powerful algorithms based on differential evolution for adaptive many-particle quantum metrology. Our new approach delivers adaptive quantum metrology policies for feedback control that are orders-of-magnitude more efficient and surpass the few-dozen-particle limitation arising in methods

Laser metrology for a next generation gravimetric mission

Science.gov (United States)

Mottini, Sergio; Biondetti, Giorgio; Cesare, Stefano; Castorina, Giuseppe; Musso, Fabio; Pisani, Marco; Leone, Bruno

2017-11-01

Within the ESA technology research project "Laser Interferometer High Precision tracking for LEO", Thales Alenia Space Italia is developing a laser metrology system for a Next Generation Gravimetric Mission (NGGM) based on satellite-to-satellite tracking. This technique is based on the precise measurement of the displacement between two satellites flying in formation at low altitude for monitoring the variations of Earth's gravity field at high resolution over a long time period. The laser metrology system that has been defined for this mission consists of the following elements: • an heterodyne Michelson interferometer for measuring the distance variation between retroreflectors positioned on the two satellites; • an angle metrology for measuring the orientation of the laser beam in the reference frames of the two satellites; • a lateral displacement metrology for measuring the deviations of the laser beam axis from the target retro-reflector. The laser interferometer makes use of a chopped measurement beam to avoid spurious signals and nonlinearity caused by the unbalance between the strong local beam and the weak return beam. The main results of the design, development and test activities performed on the breadboard of the metrology system are summarized in this paper.

Overlay improvement methods with diffraction based overlay and integrated metrology

Science.gov (United States)

Nam, Young-Sun; Kim, Sunny; Shin, Ju Hee; Choi, Young Sin; Yun, Sang Ho; Kim, Young Hoon; Shin, Si Woo; Kong, Jeong Heung; Kang, Young Seog; Ha, Hun Hwan

2015-03-01

To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern's behavior, but also the larger measurement samples are inevitable for minimizing statistical errors and better estimation of circumstance in a lot. From these reasons, diffraction based overlay (DBO) and integrated metrology (IM) were mainly proposed as new approaches for overlay enhancement in this paper.

Integration of mask and silicon metrology in DFM

Science.gov (United States)

Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

2009-03-01

We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based

Future metrology needs for FEL reflective optics

International Nuclear Information System (INIS)

Assoufid, L.

2000-01-01

An International Workshop on Metrology for X-ray and Neutron Optics has been held March 16-17, 2000, at the Advanced Photon Source, Argonne National Laboratory, near Chicago, Illinois (USA). The workshop gathered engineers and scientists from both the U.S. and around the world to evaluate metrology instrumentation and methods used to characterize surface figure and finish for long grazing incidence optics used in beamlines at synchrotrons radiation sources. This two-day workshop was motivated by the rapid evolution in the performance of x-ray and neutron sources along with requirements in optics figure and finish. More specifically, the performance of future light sources, such as free-electron laser (FEL)-based x-ray sources, is being pushed to new limits in term of both brilliance and coherence. As a consequence, tolerances on surface figure and finish of the next generation of optics are expected to become tighter. The timing of the workshop provided an excellent opportunity to study the problem, evaluate the state of the art in metrology instrumentation, and stimulate innovation on future metrology instruments and techniques to be used to characterize these optics. This paper focuses on FEL optics and metrology needs. (A more comprehensive summary of the workshop can be found elsewhere.) The performance and limitations of current metrology instrumentation will be discussed and recommendations from the workshop on future metrology development to meet the FEL challenges will be detailed

Future metrology needs for FEL reflective optics.

Energy Technology Data Exchange (ETDEWEB)

Assoufid, L.

2000-09-21

An International Workshop on Metrology for X-ray and Neutron Optics has been held March 16-17, 2000, at the Advanced Photon Source, Argonne National Laboratory, near Chicago, Illinois (USA). The workshop gathered engineers and scientists from both the U.S. and around the world to evaluate metrology instrumentation and methods used to characterize surface figure and finish for long grazing incidence optics used in beamlines at synchrotrons radiation sources. This two-day workshop was motivated by the rapid evolution in the performance of x-ray and neutron sources along with requirements in optics figure and finish. More specifically, the performance of future light sources, such as free-electron laser (FEL)-based x-ray sources, is being pushed to new limits in term of both brilliance and coherence. As a consequence, tolerances on surface figure and finish of the next generation of optics are expected to become tighter. The timing of the workshop provided an excellent opportunity to study the problem, evaluate the state of the art in metrology instrumentation, and stimulate innovation on future metrology instruments and techniques to be used to characterize these optics. This paper focuses on FEL optics and metrology needs. (A more comprehensive summary of the workshop can be found elsewhere.) The performance and limitations of current metrology instrumentation will be discussed and recommendations from the workshop on future metrology development to meet the FEL challenges will be detailed.

Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

Science.gov (United States)

Chen, Kai-Hsiung; Huang, Guo-Tsai; Hsieh, Hung-Chih; Ni, Wei-Feng; Chuang, S. M.; Chuang, T. K.; Ke, Chih-Ming; Huang, Jacky; Rao, Shiuan-An; Cumurcu Gysen, Aysegul; d'Alfonso, Maxime; Yueh, Jenny; Izikson, Pavel; Soco, Aileen; Wu, Jon; Nooitgedagt, Tjitte; Ottens, Jeroen; Kim, Yong Ho; Ebert, Martin

2017-03-01

On-product overlay requirements are becoming more challenging with every next technology node due to the continued decrease of the device dimensions and process tolerances. Therefore, current and future technology nodes require demanding metrology capabilities such as target designs that are robust towards process variations and high overlay measurement density (e.g. for higher order process corrections) to enable advanced process control solutions. The impact of advanced control solutions based on YieldStar overlay data is being presented in this paper. Multi patterning techniques are applied for critical layers and leading to additional overlay measurement demands. The use of 1D process steps results in the need of overlay measurements relative to more than one layer. Dealing with the increased number of overlay measurements while keeping the high measurement density and metrology accuracy at the same time presents a challenge for high volume manufacturing (HVM). These challenges are addressed by the capability to measure multi-layer targets with the recently introduced YieldStar metrology tool, YS350. On-product overlay results of such multi-layers and standard targets are presented including measurement stability performance.

Improving OCD time to solution using Signal Response Metrology

Science.gov (United States)

Fang, Fang; Zhang, Xiaoxiao; Vaid, Alok; Pandev, Stilian; Sanko, Dimitry; Ramanathan, Vidya; Venkataraman, Kartik; Haupt, Ronny

2016-03-01

In recent technology nodes, advanced process and novel integration scheme have challenged the precision limits of conventional metrology; with critical dimensions (CD) of device reduce to sub-nanometer region. Optical metrology has proved its capability to precisely detect intricate details on the complex structures, however, conventional RCWA-based (rigorous coupled wave analysis) scatterometry has the limitations of long time-to-results and lack of flexibility to adapt to wide process variations. Signal Response Metrology (SRM) is a new metrology technique targeted to alleviate the consumption of engineering and computation resources by eliminating geometric/dispersion modeling and spectral simulation from the workflow. This is achieved by directly correlating the spectra acquired from a set of wafers with known process variations encoded. In SPIE 2015, we presented the results of SRM application in lithography metrology and control [1], accomplished the mission of setting up a new measurement recipe of focus/dose monitoring in hours. This work will demonstrate our recent field exploration of SRM implementation in 20nm technology and beyond, including focus metrology for scanner control; post etch geometric profile measurement, and actual device profile metrology.

Metrology of electrical quantum

International Nuclear Information System (INIS)

Camon, A.

1996-01-01

Since 1989 the electrical metrology laboratory of TPYCEA and the low temperature physics department of ICMA have been collaborating in the development of electrical quantum metrology. ICMA has been mainly dedicated to implement the state of the art quantum standards for which its experience on cryogenics, superconductivity and low noise instrumentation was essential. On the other hand TPYCEA concentrated its efforts on the metrological aspects, in which it has great experience. The complimentary knowledge of both laboratories, as well as the advice obtained from several prestigious metrology institutes was the key to successful completion of the two projects so far developed: i) The Josephson voltage standard (1989-1991) ii) The quantum Hall resistance standard (1991-1996) This report contains a description of both projects. Even though we can consider that the two projects are finished from the instrumental and metrological point of view, there is still a strong cooperation between ICMA and TPYCEA on the improvement of these standards, as well as on their international validation

Toward reliable and repeatable automated STEM-EDS metrology with high throughput

Science.gov (United States)

Zhong, Zhenxin; Donald, Jason; Dutrow, Gavin; Roller, Justin; Ugurlu, Ozan; Verheijen, Martin; Bidiuk, Oleksii

2018-03-01

New materials and designs in complex 3D architectures in logic and memory devices have raised complexity in S/TEM metrology. In this paper, we report about a newly developed, automated, scanning transmission electron microscopy (STEM) based, energy dispersive X-ray spectroscopy (STEM-EDS) metrology method that addresses these challenges. Different methodologies toward repeatable and efficient, automated STEM-EDS metrology with high throughput are presented: we introduce the best known auto-EDS acquisition and quantification methods for robust and reliable metrology and present how electron exposure dose impacts the EDS metrology reproducibility, either due to poor signalto-noise ratio (SNR) at low dose or due to sample modifications at high dose conditions. Finally, we discuss the limitations of the STEM-EDS metrology technique and propose strategies to optimize the process both in terms of throughput and metrology reliability.

Economic benefits of metrology in manufacturing

DEFF Research Database (Denmark)

Savio, Enrico; De Chiffre, Leonardo; Carmignato, S.

2016-01-01

examples from industrial production, in which the added value of metrology in manufacturing is discussed and quantified. Case studies include: general manufacturing, forging, machining, and related metrology. The focus of the paper is on the improved effectiveness of metrology when used at product...... and process design stages, as well as on the improved accuracy and efficiency of manufacturing through better measuring equipment and process chains with integrated metrology for process control.......In streamlined manufacturing systems, the added value of inspection activities is often questioned, and metrology in particular is sometimes considered only as an avoidable expense. Documented quantification of economic benefits of metrology is generally not available. This work presents concrete...

Quantum metrology

International Nuclear Information System (INIS)

Xiang Guo-Yong; Guo Guang-Can

2013-01-01

The statistical error is ineluctable in any measurement. Quantum techniques, especially with the development of quantum information, can help us squeeze the statistical error and enhance the precision of measurement. In a quantum system, there are some quantum parameters, such as the quantum state, quantum operator, and quantum dimension, which have no classical counterparts. So quantum metrology deals with not only the traditional parameters, but also the quantum parameters. Quantum metrology includes two important parts: measuring the physical parameters with a precision beating the classical physics limit and measuring the quantum parameters precisely. In this review, we will introduce how quantum characters (e.g., squeezed state and quantum entanglement) yield a higher precision, what the research areas are scientists most interesting in, and what the development status of quantum metrology and its perspectives are. (topical review - quantum information)

Fringe pattern analysis for optical metrology theory, algorithms, and applications

CERN Document Server

Servin, Manuel; Padilla, Moises

2014-01-01

The main objective of this book is to present the basic theoretical principles and practical applications for the classical interferometric techniques and the most advanced methods in the field of modern fringe pattern analysis applied to optical metrology. A major novelty of this work is the presentation of a unified theoretical framework based on the Fourier description of phase shifting interferometry using the Frequency Transfer Function (FTF) along with the theory of Stochastic Process for the straightforward analysis and synthesis of phase shifting algorithms with desired properties such

Virtual Distances Methodology as Verification Technique for AACMMs with a Capacitive Sensor Based Indexed Metrology Platform

Science.gov (United States)

Acero, Raquel; Santolaria, Jorge; Brau, Agustin; Pueo, Marcos

2016-01-01

This paper presents a new verification procedure for articulated arm coordinate measuring machines (AACMMs) together with a capacitive sensor-based indexed metrology platform (IMP) based on the generation of virtual reference distances. The novelty of this procedure lays on the possibility of creating virtual points, virtual gauges and virtual distances through the indexed metrology platform’s mathematical model taking as a reference the measurements of a ball bar gauge located in a fixed position of the instrument’s working volume. The measurements are carried out with the AACMM assembled on the IMP from the six rotating positions of the platform. In this way, an unlimited number and types of reference distances could be created without the need of using a physical gauge, therefore optimizing the testing time, the number of gauge positions and the space needed in the calibration and verification procedures. Four evaluation methods are presented to assess the volumetric performance of the AACMM. The results obtained proved the suitability of the virtual distances methodology as an alternative procedure for verification of AACMMs using the indexed metrology platform. PMID:27869722

Virtual Distances Methodology as Verification Technique for AACMMs with a Capacitive Sensor Based Indexed Metrology Platform.

Science.gov (United States)

Acero, Raquel; Santolaria, Jorge; Brau, Agustin; Pueo, Marcos

2016-11-18

This paper presents a new verification procedure for articulated arm coordinate measuring machines (AACMMs) together with a capacitive sensor-based indexed metrology platform (IMP) based on the generation of virtual reference distances. The novelty of this procedure lays on the possibility of creating virtual points, virtual gauges and virtual distances through the indexed metrology platform's mathematical model taking as a reference the measurements of a ball bar gauge located in a fixed position of the instrument's working volume. The measurements are carried out with the AACMM assembled on the IMP from the six rotating positions of the platform. In this way, an unlimited number and types of reference distances could be created without the need of using a physical gauge, therefore optimizing the testing time, the number of gauge positions and the space needed in the calibration and verification procedures. Four evaluation methods are presented to assess the volumetric performance of the AACMM. The results obtained proved the suitability of the virtual distances methodology as an alternative procedure for verification of AACMMs using the indexed metrology platform.

Analysis of key technologies for virtual instruments metrology

Science.gov (United States)

Liu, Guixiong; Xu, Qingui; Gao, Furong; Guan, Qiuju; Fang, Qiang

2008-12-01

Virtual instruments (VIs) require metrological verification when applied as measuring instruments. Owing to the software-centered architecture, metrological evaluation of VIs includes two aspects: measurement functions and software characteristics. Complexity of software imposes difficulties on metrological testing of VIs. Key approaches and technologies for metrology evaluation of virtual instruments are investigated and analyzed in this paper. The principal issue is evaluation of measurement uncertainty. The nature and regularity of measurement uncertainty caused by software and algorithms can be evaluated by modeling, simulation, analysis, testing and statistics with support of powerful computing capability of PC. Another concern is evaluation of software features like correctness, reliability, stability, security and real-time of VIs. Technologies from software engineering, software testing and computer security domain can be used for these purposes. For example, a variety of black-box testing, white-box testing and modeling approaches can be used to evaluate the reliability of modules, components, applications and the whole VI software. The security of a VI can be assessed by methods like vulnerability scanning and penetration analysis. In order to facilitate metrology institutions to perform metrological verification of VIs efficiently, an automatic metrological tool for the above validation is essential. Based on technologies of numerical simulation, software testing and system benchmarking, a framework for the automatic tool is proposed in this paper. Investigation on implementation of existing automatic tools that perform calculation of measurement uncertainty, software testing and security assessment demonstrates the feasibility of the automatic framework advanced.

Management of metrology in measuring of the displacement of building construction

Directory of Open Access Journals (Sweden)

Jiří Kratochvíl

2007-06-01

Full Text Available The metrology management of the measurement of the displacement of building construction is not regulated in the standard ČSN ISO 73 0405 - Measurement of the displacement of building construction. But the metrology management has to be included in the project of measurement of the displacement (Stage of project. Then we have to pay an attention to the metrological management during this measurement (Stage of realization and during the evaluation of this measurement (Stage of evaluation. We have to insist on the subsequent improving of metrology management within the frame of the next project (so-called feedback. The metrology management in the measurement of the displacement during the stages should be based on an application of statutory instruments and technical standards. We should insist especially on the system of standards for the quality control ISO 9000. Considering specialities of geodetic measurements it is necessary to adapt the metrology management. That is why it will differ from the metrology management in other fields of knowledge. This paper includes some steps of metrological provision which must not be ignored.

Metrological AFMs and its application for versatile nano-dimensional metrology tasks

Science.gov (United States)

Dai, Gaoliang; Dziomba, T.; Pohlenz, F.; Danzebrink, H.-U.; Koenders, L.

2010-08-01

Traceable calibrations of various micro and nano measurement devices are crucial tasks for ensuring reliable measurements for micro and nanotechnology. Today metrological AFM are widely used for traceable calibrations of nano dimensional standards. In this paper, we introduced the developments of metrological force microscopes at PTB. Of the three metrological AFMs described here, one is capable of measuring in a volume of 25 mm x 25 mm x 5 mm. All instruments feature interferometers and the three-dimensional position measurements are thus directly traceable to the metre definition. Some calibration examples on, for instance, flatness standards, step height standards, one and two dimensional gratings are demonstrated.

Overlay metrology for double patterning processes

Science.gov (United States)

Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej

2009-03-01

The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians

Science.gov (United States)

Pang, Shengshi; Jordan, Andrew N.

2017-01-01

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case. PMID:28276428

A laser metrology/viewing system for ITER in-vessel inspection

International Nuclear Information System (INIS)

Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Herndon, J.N.; Menon, M.M.; Slotwinski, A.; Dagher, M.A.; Yuen, J.L.

1998-01-01

This paper identifies the requirements for the International Thermonuclear Experimental Reactor metrology and viewing system, and describes a remotely operated precision surface mapping system. A metrology system capable of achieving sub-millimeter accuracy must operate in a reactor vessel that has high gamma radiation, high vacuum, elevated temperature, and magnetic field. A coherent, frequency modulated laser radar system is under development to meet these requirements. The metrology/viewing sensor consists of a compact laser optics module linked through fiber optics to the laser source and imaging units, located outside the harsh environment. The deployment mechanism is a remotely operated telescopic-mast. Gamma irradiation to 10 7 Gy was conducted on critical sensor components at Oak Ridge National Laboratory, with no significant impact to data transmission, and analysis indicates that critical sensor components can operate in a magnetic field with certain design modifications. Plans for testing key components in a magnetic field are underway. (orig.)

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians.

Science.gov (United States)

Pang, Shengshi; Jordan, Andrew N

2017-03-09

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T 2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T 4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case.

Metrology-based control and profitability in the semiconductor industry

Science.gov (United States)

Weber, Charles

2001-06-01

This paper summarizes three studies of the semiconductor industry conducted at SEMATECH and MIT's Sloan School of Management. In conjunction they lead to the conclusion that rapid problem solving is an essential component of profitability in the semiconductor industry, and that metrology-based control is instrumental to rapid problem solving. The studies also identify the need for defect attribution. Once a source of a defect has been identified, the appropriate resources--human and technological--need to be brought into the physically optimal location for corrective action. The Internet is likely to enable effective defect attribution by inducing collaboration between different companies.

Temperature metrology

Science.gov (United States)

Fischer, J.; Fellmuth, B.

2005-05-01

The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national

Temperature metrology

International Nuclear Information System (INIS)

Fischer, J; Fellmuth, B

2005-01-01

The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national

Metrology and testing

International Nuclear Information System (INIS)

2010-01-01

The chapter presents the Metrology Service of Ionizing Radiation (SEMRI), the Metrology Service of Radioisotopes (SEMRA), the External Individual Monitoring Service (SEMEX), the Internal Individual Monitoring Service (SEMIN) and the associated laboratories, the analysis of environmental samples, system for management of quality from IRD and the National Program for intercomparison results of environmental samples analysis to radioisotopes determination

Radiation protection - quality and metrology

International Nuclear Information System (INIS)

Broutin, J.P.

2002-01-01

The radiation protection gathers three occupations: radiation protection agents; environment agents ( control and monitoring); metrology agents ( activities measurement and calibration). The quality and the metrology constitute a contribution in the technique competence and the guarantee of the service quality. This article, after a historical aspect of quality and metrology in France explains the advantages of such a policy. (N.C.)

Development of an ultrasensitive interferometry system as a key to precision metrology applications

Science.gov (United States)

Gohlke, Martin; Schuldt, Thilo; Weise, Dennis; Johann, Ulrich; Peters, Achim; Braxmaier, Claus

2009-06-01

We present a symmetric heterodyne interferometer as a prototype of a highly sensitive translation and tilt measurement system. This compact optical metrology system was developed over the past several years by EADS Astrium (Friedrichshafen) in cooperation with the Humboldt-University (Berlin) and the university of applied science Konstanz (HTWG-Konstanz). The noise performance was tested at frequencies between 10-4 and 3 Hz, the noise levels are below 1 nm/Hz 1/2 for translation and below 1 μrad/Hz1/2, for tilt measurements. For frequencies higher than 10 mHz noise levels below 5pm/Hz1/2 and 4 nrad/Hz1/2 respectively, were demonstrated. Based on this highly sensitive metrology system we also developed a dilatometer for the characterization of the CTE (coefficient of thermal expansion) of various materials, i.e. CFRP (carbon fiber reinforced plastic) or Zerodur. The currently achieved sensitivity of these measurements is better than 10-7 K-1. Future planned applications of the interferometer include ultra-high-precision surface profiling and characterization of actuator noise in low-noise opto-mechanics setups. We will give an overview of the current experimental setup and the latest measurement results.

Optical vortex metrology: Are phase singularities foes or friends in optical metrology?

DEFF Research Database (Denmark)

Takeda, M.; Wang, W.; Hanson, Steen Grüner

2008-01-01

We raise an issue whether phase singularities are foes or friends in optical metrology, and give an answer by introducing the principle and applications of a new technique which we recently proposed for displacement and flow measurements. The technique is called optical vortex metrology because i...

64nm pitch metal1 double patterning metrology: CD and OVL control by SEMCD, image based overlay and diffraction based overlay

Science.gov (United States)

Ducoté, Julien; Dettoni, Florent; Bouyssou, Régis; Le-Gratiet, Bertrand; Carau, Damien; Dezauzier, Christophe

2015-03-01

Patterning process control of advanced nodes has required major changes over the last few years. Process control needs of critical patterning levels since 28nm technology node is extremely aggressive showing that metrology accuracy/sensitivity must be finely tuned. The introduction of pitch splitting (Litho-Etch-Litho-Etch) at 14FDSOInm node requires the development of specific metrologies to adopt advanced process control (for CD, overlay and focus corrections). The pitch splitting process leads to final line CD uniformities that are a combination of the CD uniformities of the two exposures, while the space CD uniformities are depending on both CD and OVL variability. In this paper, investigations of CD and OVL process control of 64nm minimum pitch at Metal1 level of 14FDSOI technology, within the double patterning process flow (Litho, hard mask etch, line etch) are presented. Various measurements with SEMCD tools (Hitachi), and overlay tools (KT for Image Based Overlay - IBO, and ASML for Diffraction Based Overlay - DBO) are compared. Metrology targets are embedded within a block instanced several times within the field to perform intra-field process variations characterizations. Specific SEMCD targets were designed for independent measurement of both line CD (A and B) and space CD (A to B and B to A) for each exposure within a single measurement during the DP flow. Based on those measurements correlation between overlay determined with SEMCD and with standard overlay tools can be evaluated. Such correlation at different steps through the DP flow is investigated regarding the metrology type. Process correction models are evaluated with respect to the measurement type and the intra-field sampling.

A Roadmap for Thermal Metrology

Science.gov (United States)

Bojkovski, J.; Fischer, J.; Machin, G.; Pavese, F.; Peruzzi, A.; Renaot, E.; Tegeler, E.

2009-02-01

A provisional roadmap for thermal metrology was developed in Spring 2006 as part of the EUROMET iMERA activity toward increasing impact from national investment in European metrology R&D. This consisted of two parts: one addressing the influence of thermal metrology on society, industry, and science, and the other specifying the requirements of enabling thermal metrology to serve future needs. The roadmap represents the shared vision of the EUROMET TC Therm committee as to how thermal metrology should develop to meet future requirements over the next 15 years. It is important to stress that these documents are a first attempt to roadmap the whole of thermal metrology and will certainly need regular review and revision to remain relevant and useful to the community they seek to serve. The first part of the roadmap, “Thermal metrology for society, industry, and science,” identifies the main social and economic triggers driving developments in thermal metrology—notably citizen safety and security, new production technologies, environment and global climate change, energy, and health. Stemming from these triggers, key targets are identified that require improved thermal measurements. The second part of the roadmap, “Enabling thermal metrology to serve future needs” identifies another set of triggers, like global trade and interoperability, future needs in transport, and the earth radiation budget. Stemming from these triggers, key targets are identified, such as improved realizations and dissemination of the SI unit the kelvin, anchoring the kelvin to the Boltzmann constant, k B, and calculating thermal properties from first principles. To facilitate these outcomes, the roadmap identifies the technical advances required in thermal measurement standards.

Metrological large range scanning probe microscope

International Nuclear Information System (INIS)

Dai Gaoliang; Pohlenz, Frank; Danzebrink, Hans-Ulrich; Xu Min; Hasche, Klaus; Wilkening, Guenter

2004-01-01

We describe a metrological large range scanning probe microscope (LR-SPM) with an Abbe error free design and direct interferometric position measurement capability, aimed at versatile traceable topographic measurements that require nanometer accuracy. A dual-stage positioning system was designed to achieve both a large measurement range and a high measurement speed. This dual-stage system consists of a commercially available stage, referred to as nanomeasuring machine (NMM), with a motion range of 25 mmx25 mmx5 mm along x, y, and z axes, and a compact z-axis piezoelectric positioning stage (compact z stage) with an extension range of 2 μm. The metrological LR-SPM described here senses the surface using a stationary fixed scanning force microscope (SFM) head working in contact mode. During operation, lateral scanning of the sample is performed solely by the NMM. Whereas the z motion, controlled by the SFM signal, is carried out by a combination of the NMM and the compact z stage. In this case the compact z stage, with its high mechanical resonance frequency (greater than 20 kHz), is responsible for the rapid motion while the NMM simultaneously makes slower movements over a larger motion range. To reduce the Abbe offset to a minimum the SFM tip is located at the intersection of three interferometer measurement beams orientated in x, y, and z directions. To improve real time performance two high-end digital signal processing (DSP) systems are used for NMM positioning and SFM servocontrol. Comprehensive DSP firmware and Windows XP-based software are implemented, providing a flexible and user-friendly interface. The instrument is able to perform large area imaging or profile scanning directly without stitching small scanned images. Several measurements on different samples such as flatness standards, nanostep height standards, roughness standards as well as sharp nanoedge samples and 1D gratings demonstrate the outstanding metrological capabilities of the instrument

Correlation methods in optical metrology with state-of-the-art x-ray mirrors

Science.gov (United States)

Yashchuk, Valeriy V.; Centers, Gary; Gevorkyan, Gevork S.; Lacey, Ian; Smith, Brian V.

2018-01-01

The development of fully coherent free electron lasers and diffraction limited storage ring x-ray sources has brought to focus the need for higher performing x-ray optics with unprecedented tolerances for surface slope and height errors and roughness. For example, the proposed beamlines for the future upgraded Advance Light Source, ALS-U, require optical elements characterized by a residual slope error of optics with a length of up to one meter. However, the current performance of x-ray optical fabrication and metrology generally falls short of these requirements. The major limitation comes from the lack of reliable and efficient surface metrology with required accuracy and with reasonably high measurement rate, suitable for integration into the modern deterministic surface figuring processes. The major problems of current surface metrology relate to the inherent instrumental temporal drifts, systematic errors, and/or an unacceptably high cost, as in the case of interferometry with computer-generated holograms as a reference. In this paper, we discuss the experimental methods and approaches based on correlation analysis to the acquisition and processing of metrology data developed at the ALS X-Ray Optical Laboratory (XROL). Using an example of surface topography measurements of a state-of-the-art x-ray mirror performed at the XROL, we demonstrate the efficiency of combining the developed experimental correlation methods to the advanced optimal scanning strategy (AOSS) technique. This allows a significant improvement in the accuracy and capacity of the measurements via suppression of the instrumental low frequency noise, temporal drift, and systematic error in a single measurement run. Practically speaking, implementation of the AOSS technique leads to an increase of the measurement accuracy, as well as the capacity of ex situ metrology by a factor of about four. The developed method is general and applicable to a broad spectrum of high accuracy measurements.

Joint Research on Scatterometry and AFM Wafer Metrology

Science.gov (United States)

Bodermann, Bernd; Buhr, Egbert; Danzebrink, Hans-Ulrich; Bär, Markus; Scholze, Frank; Krumrey, Michael; Wurm, Matthias; Klapetek, Petr; Hansen, Poul-Erik; Korpelainen, Virpi; van Veghel, Marijn; Yacoot, Andrew; Siitonen, Samuli; El Gawhary, Omar; Burger, Sven; Saastamoinen, Toni

2011-11-01

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurement systems in measurement comparisons. Additionally novel methods for sophisticated data analysis will be developed and investigated to reach significant reductions of the measurement uncertainties in critical dimension (CD) metrology. One final goal will be the realisation of a wafer based reference standard material for calibration of scatterometers.

Metrology measurements for large-aperture VPH gratings

Science.gov (United States)

Zheng, Jessica R.; Gers, Luke; Heijmans, Jeroen

2013-09-01

The High Efficiency and Resolution Multi Element Spectrograph (HERMES) for the Australian Astronomical Observatory (AAO) uses four large aperture, high angle of incidence volume phase holographic gratings (VPHG) for high resolution `Galactic archaeology' spectroscopy. The large clear aperture, the high diffraction efficiency, the line frequency homogeneity, and mosaic alignment made manufacturing and testing challenging. We developed new metrology systems at the AAO to verify the performance of these VPH gratings. The measured diffraction efficiencies and line frequency of the VPH gratings received so far meet the vendor's provided data. The wavefront quality for the Blue VPH grating is good but the Green and Red VPH gratings need to be post polishing.

Magnetic nanoparticles. Metrological aspects

International Nuclear Information System (INIS)

Nikiforov, V N; Nikiforov, A V; Oxengendler, B L; Turaeva, N N; Sredin, V G

2011-01-01

The experiments on influence of the iron oxide cluster size on the specific magnetic moment are performed. Both free and covered clusters are investigated. The experiments are interpreted on the base of core-shell model by analogy to Weizsaecker formula in the nuclear physics. Metrological parameters for the cluster size investigation are obtained.

Real cell overlay measurement through design based metrology

Science.gov (United States)

Yoo, Gyun; Kim, Jungchan; Park, Chanha; Lee, Taehyeong; Ji, Sunkeun; Jo, Gyoyeon; Yang, Hyunjo; Yim, Donggyu; Yamamoto, Masahiro; Maruyama, Kotaro; Park, Byungjun

2014-04-01

Until recent device nodes, lithography has been struggling to improve its resolution limit. Even though next generation lithography technology is now facing various difficulties, several innovative resolution enhancement technologies, based on 193nm wavelength, were introduced and implemented to keep the trend of device scaling. Scanner makers keep developing state-of-the-art exposure system which guarantees higher productivity and meets a more aggressive overlay specification. "The scaling reduction of the overlay error has been a simple matter of the capability of exposure tools. However, it is clear that the scanner contributions may no longer be the majority component in total overlay performance. The ability to control correctable overlay components is paramount to achieve the desired performance.(2)" In a manufacturing fab, the overlay error, determined by a conventional overlay measurement: by using an overlay mark based on IBO and DBO, often does not represent the physical placement error in the cell area of a memory device. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion, caused by etching or CMP, also can be a source of the mismatch. Therefore, the requirement of a direct overlay measurement in the cell pattern gradually increases in the manufacturing field, and also in the development level. In order to overcome the mismatch between conventional overlay measurement and the real placement error of layer to layer in the cell area of a memory device, we suggest an alternative overlay measurement method utilizing by design, based metrology tool. A basic concept of this method is shown in figure1. A CD-SEM measurement of the overlay error between layer 1 and 2 could be the ideal method but it takes too long time to extract a lot of data from wafer level. An E-beam based DBM tool provides high speed to cover the whole wafer with high repeatability. It is enabled by using the design as a

A stabilized optical frequency comb based on an Er-doped fiber femtosecond laser

Science.gov (United States)

Xia, Chuanqing; Wu, Tengfei; Zhao, Chunbo; Xing, Shuai

2018-03-01

An optical frequency comb based on a 250 MHz home-made Er-doped fiber femtosecond laser is presented in this paper. The Er-doped fiber laser has a ring cavity and operates mode-locked in femtosecond regime with the technique of nonlinear polarization rotation. The pulse duration is 118 fs and the spectral width is 30 nm. A part of the femtosecond laser is amplified in Er-doped fiber amplifier before propagating through a piece of highly nonlinear fiber for expanding the spectrum. The carrier-envelope offset frequency of the comb which has a signal-to-noise ratio more than 35 dB is extracted by means of f-2f beating. It demonstrates that both carrier-envelope offset frequency and repetition frequency keep phase locked to a Rubidium atomic clock simultaneously for 2 hours. The frequency stabilized fiber combs will be increasingly applied in optical metrology, attosecond pulse generation, and absolute distance measurement.

Metrological assurance and traceability for Industry 4.0 and additive manufacturing in Ukraine

Science.gov (United States)

Skliarov, Volodymyr; Neyezhmakov, Pavel; Prokopov, Alexander

2018-03-01

The national measurement standards from the point of view of traceability of the results of measurement in additive manufacturing in Ukraine are considered in the paper. The metrological characteristics of the national primary measurement standards in the field of geometric, temperature, optical-physical and time-frequency measurements, which took part in international comparisons within COOMET projects, are presented. The accurate geometric, temperature, optical-physical and time-frequency measurements are the key ones in controlling the quality of additive manufacturing. The use of advanced CAD/CAE/CAM systems allows to simulate the process of additive manufacturing at each stage. In accordance with the areas of the technology of additive manufacturing, the ways of improving the national measurement standards of Ukraine for the growing needs of metrology of additive manufacturing are considered.

Metrology at Philip Morris Europe

Directory of Open Access Journals (Sweden)

Gualandris R

2014-12-01

Full Text Available The importance of the metrology function at Philip Morris Europe (PME, a multinational organisation producing at over 40 sites in the European, Middle Eastern and African Regions is presented. Standardisation of test methods and equipment as well as the traceability of calibration gauges to the same reference gauge are essential in order to obtain comparable results among the various production centers. The metrology function as well as the qualification of instruments and the drafting of test and calibration operating procedures for this region are conducted or co-ordinated by the Research and Development Department in Neuchatel, Switzerland. In this paper the metrology function within PME is presented based on the measurement of the resistance to draw for which the PME R&D laboratory is accredited (ISO/CEI 17025, as both a calibration and a testing laboratory. The following topics are addressed in this paper: traceability of calibration standards to national standards; comparison of results among manufacturing centres; the choice, the budget as well as the computation of uncertainties. Furthermore, some practical aspects related to the calibration and use of the glass multicapillary gauges are discussed.

Improving Metrological Reliability of Information-Measuring Systems Using Mathematical Modeling of Their Metrological Characteristics

Science.gov (United States)

Kurnosov, R. Yu; Chernyshova, T. I.; Chernyshov, V. N.

2018-05-01

The algorithms for improving the metrological reliability of analogue blocks of measuring channels and information-measuring systems are developed. The proposed algorithms ensure the optimum values of their metrological reliability indices for a given analogue circuit block solution.

IT Security Standards and Legal Metrology - Transfer and Validation

Science.gov (United States)

Thiel, F.; Hartmann, V.; Grottker, U.; Richter, D.

2014-08-01

Legal Metrology's requirements can be transferred into the IT security domain applying a generic set of standardized rules provided by the Common Criteria (ISO/IEC 15408). We will outline the transfer and cross validation of such an approach. As an example serves the integration of Legal Metrology's requirements into a recently developed Common Criteria based Protection Profile for a Smart Meter Gateway designed under the leadership of the Germany's Federal Office for Information Security. The requirements on utility meters laid down in the Measuring Instruments Directive (MID) are incorporated. A verification approach to check for meeting Legal Metrology's requirements by their interpretation through Common Criteria's generic requirements is also presented.

Using RF Smart Points for the Improvement of Metrological Activities

Directory of Open Access Journals (Sweden)

Claudio de Capua

2007-03-01

Full Text Available This work describes the realization of a “radio-frequency identification system” for the improvement of the activities of a metrological laboratory. Some radio-frequency modules, called by the authors RF Smart Points (“radio-frequency smart points”, have been designed to store into their memories all data which are necessary for the instruments tracking (the type of instruments, their identification numbers or serial numbers, the manufacturer, the date when they have been admitted to the installed base of the laboratory, their working state, the elapsed time from the last calibration procedure. The insertion of the data and the inquiry of the instruments are executed by the technical staff of the laboratory through a PDA (Personal Digital Assistant or a PC, which manage the radio-frequency communication by using the RS 232 interface for sending messages to a RF Transceiver. The executable software for managing the communication between the Smart Points and the “PDA/PC-Controllers” is realized in LabVIEW graphical programming environment.

Advances in speckle metrology and related techniques

CERN Document Server

Kaufmann, Guillermo H

2010-01-01

Speckle metrology includes various optical techniques that are based on the speckle fields generated by reflection from a rough surface or by transmission through a rough diffuser. These techniques have proven to be very useful in testing different materials in a non-destructive way. They have changed dramatically during the last years due to the development of modern optical components, with faster and more powerful digital computers, and novel data processing approaches. This most up-to-date overview of the topic describes new techniques developed in the field of speckle metrology over the l

On Frequency Combs in Monolithic Resonators

Science.gov (United States)

Savchenkov, A. A.; Matsko, A. B.; Maleki, L.

2016-06-01

Optical frequency combs have become indispensable in astronomical measurements, biological fingerprinting, optical metrology, and radio frequency photonic signal generation. Recently demonstrated microring resonator-based Kerr frequency combs point the way towards chip scale optical frequency comb generator retaining major properties of the lab scale devices. This technique is promising for integrated miniature radiofrequency and microwave sources, atomic clocks, optical references and femtosecond pulse generators. Here we present Kerr frequency comb development in a historical perspective emphasizing its similarities and differences with other physical phenomena. We elucidate fundamental principles and describe practical implementations of Kerr comb oscillators, highlighting associated solved and unsolved problems.

Effect of measurement error budgets and hybrid metrology on qualification metrology sampling

Science.gov (United States)

Sendelbach, Matthew; Sarig, Niv; Wakamoto, Koichi; Kim, Hyang Kyun (Helen); Isbester, Paul; Asano, Masafumi; Matsuki, Kazuto; Osorio, Carmen; Archie, Chas

2014-10-01

Until now, metrologists had no statistics-based method to determine the sampling needed for an experiment before the start that accuracy experiment. We show a solution to this problem called inverse total measurement uncertainty (TMU) analysis, by presenting statistically based equations that allow the user to estimate the needed sampling after providing appropriate inputs, allowing him to make important "risk versus reward" sampling, cost, and equipment decisions. Application examples using experimental data from scatterometry and critical dimension scanning electron microscope tools are used first to demonstrate how the inverse TMU analysis methodology can be used to make intelligent sampling decisions and then to reveal why low sampling can lead to unstable and misleading results. One model is developed that can help experimenters minimize sampling costs. A second cost model reveals the inadequacy of some current sampling practices-and the enormous costs associated with sampling that provides reasonable levels of certainty in the result. We introduce the strategies on how to manage and mitigate these costs and begin the discussion on how fabs are able to manufacture devices using minimal reference sampling when qualifying metrology steps. Finally, the relationship between inverse TMU analysis and hybrid metrology is explored.

A Century of Acoustic Metrology

DEFF Research Database (Denmark)

Rasmussen, Knud

1998-01-01

The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect.......The development in acoustic measurement technique over the last century is reviewed with special emphasis on the metrological aspect....

La Metrología Óptica y sus Aplicaciones La Metrología Óptica y sus Aplicaciones

OpenAIRE

Daniel Malacara Hernández

2012-01-01

En este trabajo se presenta una introducción al campo de la metrología óptica y de su herramienta principal que es la interferometría. También se presenta un panorama de los diferentes métodos empleados en metrología describiendo con especial detalle los avances más recientes en este campo. In this work an introduction to optical metrology is presented with a brief description of its main tool which is interferometry. Also, a survey of the main different methods used in optical metrology is ...

Frequency metrology on the Mg 3s21S→3s4p 1P line for comparison with quasar data

International Nuclear Information System (INIS)

Hannemann, S.; Salumbides, E. J.; Witte, S.; Zinkstok, R. Th.; Duijn, E.-J. van; Eikema, K. S. E.; Ubachs, W.

2006-01-01

We report a frequency metrology study on the Mg 3s 2 1 S→3s4p 1 P transition near 202.5 nm. For this purpose, the fourth harmonic of the output from an injection-seeded Ti:sapphire pulsed laser is employed in a Mg atomic beam experiment with laser-induced fluorescence detection. Absolute frequency calibration with a frequency comb laser is performed on the cw seeding radiation, while the chirp-induced frequency shift between the pulsed output and the seed light is monitored on line. The resulting transition frequency for the main isotope 24 Mg is determined at 49 346.756 809(35) m -1 . This value is three orders of magnitude more precise than the best value in the literature. The line positions of the other isotopes 25 Mg and 26 Mg are also measured at comparable accuracy, giving rise to very exact values for the isotopic shifts. The achieved precision for the transition frequency at the 7x10 -10 level makes this second resonance line of Mg I an additional candidate for inclusion in many-multiplet methods, aimed at detecting a possible temporal variation of the fine-structure constant α from comparison with quasar spectra. The isotopic shifts obtained are also important to correct for possible systematic shifts due to evolution of isotopic abundances, which may mimic α-variation effects

Long distance measurement with a femtosecond laser based frequency comb

Science.gov (United States)

Bhattacharya, N.; Cui, M.; Zeitouny, M. G.; Urbach, H. P.; van den Berg, S. A.

2017-11-01

Recent advances in the field of ultra-short pulse lasers have led to the development of reliable sources of carrier envelope phase stabilized femtosecond pulses. The pulse train generated by such a source has a frequency spectrum that consists of discrete, regularly spaced lines known as a frequency comb. In this case both the frequency repetition and the carrier-envelope-offset frequency are referenced to a frequency standard, like an atomic clock. As a result the accuracy of the frequency standard is transferred to the optical domain, with the frequency comb as transfer oscillator. These unique properties allow the frequency comb to be applied as a versatile tool, not only for time and frequency metrology, but also in fundamental physics, high-precision spectroscopy, and laser noise characterization. The pulse-to-pulse phase relationship of the light emitted by the frequency comb has opened up new directions for long range highly accurate distance measurement.

SAQP pitch walk metrology using single target metrology

Science.gov (United States)

Fang, Fang; Herrera, Pedro; Kagalwala, Taher; Camp, Janay; Vaid, Alok; Pandev, Stilian; Zach, Franz

2017-03-01

Self-aligned quadruple patterning (SAQP) processes have found widespread acceptance in advanced technology nodes to drive device scaling beyond the resolution limitations of immersion scanners. Of the four spaces generated in this process from one lithography pattern two tend to be equivalent as they are derived from the first spacer deposition. The three independent spaces are commonly labelled as α, β and γ. α, β and γ are controlled by multiple process steps including the initial lithographic patterning process, the two mandrel and spacer etches as well as the two spacer depositions. Scatterometry has been the preferred metrology approach, however is restricted to repetitive arrays. In these arrays independent measurements, in particular of alpha and gamma, are not possible due to degeneracy of the standard array targets. . In this work we present a single target approach which lifts the degeneracies commonly encountered while using product relevant layout geometries. We will first describe the metrology approach which includes the previously described SRM (signal response metrology) combined with reference data derived from CD SEM data. The performance of the methodology is shown in figures 1-3. In these figures the optically determined values for alpha, beta and gamma are compared to the CD SEM reference data. The variations are achieved using controlled process experiments varying Mandrel CD and Spacer deposition thicknesses.

Chemical metrology, strategic job for the Chilean Nuclear Energy Commission

International Nuclear Information System (INIS)

Gras, Nuri; Munoz, Luis; Cortes, Eduardo

2001-01-01

The National Standardization Institute's (INN) Metrology unit prepared a study in 1996 to evaluate the impact of metrological activity in Chile. This study was based on a survey of the supply and demand of metrological services and on studies of the behavior of the production system and technological services in Chile during the period 1990-1996. With the information obtained in this study the economic impact resulting from the lack of a national metrology system could be evaluated. This impact was estimated to be a 5% loss in gross national product equal to 125-500 million dollars because of direct product rejection in the mining, fisheries, agricultural and manufacturing sectors. Chemical measurements are responsible for 50% of these losses. In response to this need and coordinated by the INN, a metrological network of reference laboratories began to operate in 1997 for the principal physical magnitudes (mass, temperature, longitude and force) and a CORFO-FDI project began in 2001 that includes the chemical magnitudes. The Chilean Nuclear Energy Commission, aware of the problem's importance and the amount of economic damage that the country may suffer, as a result of these deficiencies, has formed a Chemical Metrology Unit to provide technical support. It aims to raise the standards of local analytical laboratories by providing international recognition to the export sector. Nuclear analytical techniques are used as reference methods. This work describes the laboratories that are included in this Chemical Metrology Unit and the historical contribution to the development of local analytical chemistry. The national and international projects are described together with the publications they have generated. The quality assurance program applied to the laboratories is described as well, which has led to the accreditation of the analytical chemical assays. The procedures used for validation and calculation of uncertain nuclear methodologies are described together with

Computed tomography for dimensional metrology

DEFF Research Database (Denmark)

Kruth, J.P.; Bartscher, M.; Carmignato, S.

2011-01-01

metrology, putting emphasis on issues as accuracy, traceability to the unit of length (the meter) and measurement uncertainty. It provides a state of the art (anno 2011) and application examples, showing the aptitude of CT metrology to: (i) check internal dimensions that cannot be measured using traditional...

On Frequency Combs in Monolithic Resonators

Directory of Open Access Journals (Sweden)

Savchenkov A. A.

2016-06-01

Full Text Available Optical frequency combs have become indispensable in astronomical measurements, biological fingerprinting, optical metrology, and radio frequency photonic signal generation. Recently demonstrated microring resonator-based Kerr frequency combs point the way towards chip scale optical frequency comb generator retaining major properties of the lab scale devices. This technique is promising for integrated miniature radiofrequency and microwave sources, atomic clocks, optical references and femtosecond pulse generators. Here we present Kerr frequency comb development in a historical perspective emphasizing its similarities and differences with other physical phenomena. We elucidate fundamental principles and describe practical implementations of Kerr comb oscillators, highlighting associated solved and unsolved problems.

Precision metrology of NSTX surfaces using coherent laser radar ranging

International Nuclear Information System (INIS)

Kugel, H.W.; Loesser, D.; Roquemore, A. L.; Menon, M. M.; Barry, R. E.

2000-01-01

A frequency modulated Coherent Laser Radar ranging diagnostic is being used on the National Spherical Torus Experiment (NSTX) for precision metrology. The distance (range) between the 1.5 microm laser source and the target is measured by the shift in frequency of the linearly modulated beam reflected off the target. The range can be measured to a precision of < 100microm at distances of up to 22 meters. A description is given of the geometry and procedure for measuring NSTX interior and exterior surfaces during open vessel conditions, and the results of measurements are elaborated

Metrology network: a case study on the metrology network of defense and security from SIBRATEC

International Nuclear Information System (INIS)

Pereira, Marisa Ferraz Figueira

2016-01-01

This study is focused on understanding the effects of the infrastructure improvement of these laboratories and the role of network management in offering support and metrological services to the defense and security sector enterprises, within the project purposes. It is also aimed identify gaps on offering calibration and, or testing services to supply demands of the defense and security industries, and analyze adequacy of RDS project to demands of defense and security industries, with the purpose to contribute with information for future actions. The experimental research is qualitative type, with exploratory research characteristics, based on case study. It was structured in two parts, involving primary data collection and secondary data. In order to collect the primary data two questionnaires were prepared, one (Questionnaire A) to the five RDS laboratories representatives and other (Questionnaire B) to the contacts of 63 defense and security enterprises which need calibration and test services, possible customers of RDS laboratories. Answers from four representatives of RDS laboratories and from 26 defense and security enterprises were obtained. The collection of secondary data was obtained from documentary research. The analysis was made based on five dimensions defined in order to organize and improve the understanding of the research setting. They are RDS project coverage, regional, network management, metrological traceability and importance and visibility of RDS. The results indicated that the performance of RDS does not interfere, by that time, in the metrological traceability of the products of the defense and security enterprises that participated in the research. (author)

Validation of virtual instrument for data analysis in metrology of time and frequency; Validacao do instrumento virtual para analise de dados em metrologia de tempo e frequencia

Energy Technology Data Exchange (ETDEWEB)

Jordao, Bruno; Quaresma, Daniel; Rocha, Pedro; Carvalho, Ricardo, E-mail: bjordan@on.br [Observatorio Nacional (ON), Rio de Janeiro, RJ (Brazil). Laboratorio Primario de Tempo e Frequencia; Peixoto, Jose Guilherme [Instituto de Radioprotecao e Dosimetria (LNMRI/IRD/CNEN-RJ), Rio de Janeiro, RJ (Brazil). Laboratorio Nacional de Metrologia das Radiacoes Ionizantes

2016-07-01

Commercial Software (CS) for collection, analysis and plot time and frequency data plots are being increasingly used in reference laboratories worldwide. With this, it has greatly improved the results of calculations of uncertainty for these values. We propose the creation of a collection of software and data analysis using Virtual Instruments (VI) developed the Primary Laboratory Time and frequency of the National Observatory - ON and validation of this instrument. To validate the instrument developed, it made a comparative analysis between the results obtained (VI) with the results obtained by (CS) widely used in many metrology laboratories. From these results we can conclude that there was equivalence between the analyzed data. (author)

Advanced overlay analysis through design based metrology

Science.gov (United States)

Ji, Sunkeun; Yoo, Gyun; Jo, Gyoyeon; Kang, Hyunwoo; Park, Minwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Yim, Donggyu; Maruyama, Kotaro; Park, Byungjun; Yamamoto, Masahiro

2015-03-01

As design rule shrink, overlay has been critical factor for semiconductor manufacturing. However, the overlay error which is determined by a conventional measurement with an overlay mark based on IBO and DBO often does not represent the physical placement error in the cell area. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion caused by etching or CMP also can be a source of the mismatch. In 2014, we have demonstrated that method of overlay measurement in the cell area by using DBM (Design Based Metrology) tool has more accurate overlay value than conventional method by using an overlay mark. We have verified the reproducibility by measuring repeatable patterns in the cell area, and also demonstrated the reliability by comparing with CD-SEM data. We have focused overlay mismatching between overlay mark and cell area until now, further more we have concerned with the cell area having different pattern density and etch loading. There appears a phenomenon which has different overlay values on the cells with diverse patterning environment. In this paper, the overlay error was investigated from cell edge to center. For this experiment, we have verified several critical layers in DRAM by using improved(Better resolution and speed) DBM tool, NGR3520.

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

Science.gov (United States)

Lee, Hong-Goo; Schmitt-Weaver, Emil; Kim, Min-Suk; Han, Sang-Jun; Kim, Myoung-Soo; Kwon, Won-Taik; Park, Sung-Ki; Ryan, Kevin; Theeuwes, Thomas; Sun, Kyu-Tae; Lim, Young-Wan; Slotboom, Daan; Kubis, Michael; Staecker, Jens

2015-03-01

While semiconductor manufacturing moves toward the 7nm node for logic and 15nm node for memory, an increased emphasis has been placed on reducing the influence known contributors have toward the on product overlay budget. With a machine learning technique known as function approximation, we use a neural network to gain insight to how known contributors, such as those collected with scanner metrology, influence the on product overlay budget. The result is a sufficiently trained function that can approximate overlay for all wafers exposed with the lithography system. As a real world application, inline metrology can be used to measure overlay for a few wafers while using the trained function to approximate overlay vector maps for the entire lot of wafers. With the approximated overlay vector maps for all wafers coming off the track, a process engineer can redirect wafers or lots with overlay signatures outside the standard population to offline metrology for excursion validation. With this added flexibility, engineers will be given more opportunities to catch wafers that need to be reworked, resulting in improved yield. The quality of the derived corrections from measured overlay metrology feedback can be improved using the approximated overlay to trigger, which wafers should or shouldn't be, measured inline. As a development or integration engineer the approximated overlay can be used to gain insight into lots and wafers used for design of experiments (DOE) troubleshooting. In this paper we will present the results of a case study that follows the machine learning function approximation approach to data analysis, with production overlay measured on an inline metrology system at SK hynix.

Advanced metrology by offline SEM data processing

Science.gov (United States)

Lakcher, Amine; Schneider, Loïc.; Le-Gratiet, Bertrand; Ducoté, Julien; Farys, Vincent; Besacier, Maxime

2017-06-01

Today's technology nodes contain more and more complex designs bringing increasing challenges to chip manufacturing process steps. It is necessary to have an efficient metrology to assess process variability of these complex patterns and thus extract relevant data to generate process aware design rules and to improve OPC models. Today process variability is mostly addressed through the analysis of in-line monitoring features which are often designed to support robust measurements and as a consequence are not always very representative of critical design rules. CD-SEM is the main CD metrology technique used in chip manufacturing process but it is challenged when it comes to measure metrics like tip to tip, tip to line, areas or necking in high quantity and with robustness. CD-SEM images contain a lot of information that is not always used in metrology. Suppliers have provided tools that allow engineers to extract the SEM contours of their features and to convert them into a GDS. Contours can be seen as the signature of the shape as it contains all the dimensional data. Thus the methodology is to use the CD-SEM to take high quality images then generate SEM contours and create a data base out of them. Contours are used to feed an offline metrology tool that will process them to extract different metrics. It was shown in two previous papers that it is possible to perform complex measurements on hotspots at different process steps (lithography, etch, copper CMP) by using SEM contours with an in-house offline metrology tool. In the current paper, the methodology presented previously will be expanded to improve its robustness and combined with the use of phylogeny to classify the SEM images according to their geometrical proximities.

NIF Target Assembly Metrology Methodology and Results

Energy Technology Data Exchange (ETDEWEB)

Alger, E. T. [General Atomics, San Diego, CA (United States); Kroll, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Dzenitis, E. G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Montesanti, R. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Hughes, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Swisher, M. [IAP, Livermore, CA (United States); Taylor, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Segraves, K. [IAP, Livermore, CA (United States); Lord, D. M. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Reynolds, J. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Castro, C. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); Edwards, G. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

2011-01-01

During our inertial confinement fusion (ICF) experiments at the National Ignition Facility (NIF) we require cryogenic targets at the 1-cm scale to be fabricated, assembled, and metrologized to micron-level tolerances. During assembly of these ICF targets, there are physical dimensmetrology is completed using optical coordinate measurement machines that provide repeatable measurements with micron precision, while also allowing in-process data collection for absolute accuracy in assembly. To date, 51 targets have been assembled and metrologized, and 34 targets have been successfully fielded on NIF relying on these metrology data. In the near future, ignition experiments on NIF will require tighter tolerances and more demanding target assembly and metrology capability. Metrology methods, calculations, and uncertainty estimates will be discussed. Target diagnostic port alignment, target position, and capsule location results will be reviewed for the 2009 Energetics Campaign. The information is presented via control charts showing the effect of process improvements that were made during target production. Certain parameters, including capsule position, met the 2009 campaign specifications but will have much tighter requirements in the future. Finally, in order to meet these new requirements assembly process changes and metrology capability upgrades will be necessary.

Metrology's role in quality assurance

International Nuclear Information System (INIS)

Zeederberg, L.B.

1982-01-01

Metrology, the science of measurement, is playing an increasing role in modern industry as part of an on-going quality assurance programme. At Escom, quality assurance was critical during the construction of the Koeberg nuclear facility, and also a function in controlling services provided by Escom. This article deals with the role metrology plays in quality assurance

Metrology Techniques for the Assembly of NCSX

International Nuclear Information System (INIS)

Priniski, C.; Dodson, T.; Duco, M.; Raftopoulos, S.; Ellis, R.; Brooks, A.

2009-01-01

In support of the National Compact Stellerator Experiment (NCSX), stellerator assembly activities continued this past year at the Princeton Plasma Physics Laboratory (PPPL) in partnership with the Oak Ridge National Laboratory (ORNL). The construction program saw the completion of the first two Half Field-Period Assemblies (HPA), each consisting of three modular coils. The full machine includes six such sub-assemblies. A single HPA consists of three of the NCSX modular coils wound and assembled at PPPL. These geometrically-complex three dimensional coils were wound using computer-aided metrology and CAD models to tolerances within +/- 0.5mm. The assembly of these coils required similar accuracy on a larger scale with the added complexity of more individual parts and fewer degrees of freedom for correction. Several new potential positioning issues developed for which measurement and control techniques were developed. To accomplish this, CAD coordinate-based computer metrology equipment and software similar to the solutions employed for winding the modular coils was used. Given the size of the assemblies, the primary tools were both interferometer aided and Absolute Distance Measurement (ADM)-only based laser trackers. In addition, portable Coordinate Measurement Machine (CMM) arms and some novel indirect measurement techniques were employed. This paper will detail both the use of CAD coordinate-based metrology technology and the techniques developed and employed for dimensional control of NSCX subassemblies. The results achieved and possible improvements to techniques will be discussed.

Laboratorio de Metrología - LABM

OpenAIRE

Jaramillo Ch., Zaira J.

2011-01-01

esos y transacciones de forma transparente y justa para todas las partes involucradas. Una herramienta necesaria para este propósito es la Metrología, ciencia que es utilizada en el Laboratorio de Metrología (LABM) del Centro Experimenta

Improved capacity in ionizing radiation metrology at SANAEM

International Nuclear Information System (INIS)

Yucel, U.

2014-01-01

Full text : Turkey is planning to build nuclear power plants in the south and north coasts to supply the ever-increasing energy demand. The nuclear power plants based on old soviet technology in Armenia and Bulgaria close to Turkey's borders also makes constant monitoring of environmental radioactivity extremely important due to public health and environment contamination concerns. Radiation Metrology Division at SANAEM has been established in 2012 to provide uniformity and reliability of the measurements in the field of ionizing radiation metrology by R and D studies and by constituting, developing, keeping and extending internationally accepted reference measurement standards and techniques

Adjustment method for embedded metrology engine in an EM773 series microcontroller.

Science.gov (United States)

Blazinšek, Iztok; Kotnik, Bojan; Chowdhury, Amor; Kačič, Zdravko

2015-09-01

This paper presents the problems of implementation and adjustment (calibration) of a metrology engine embedded in NXP's EM773 series microcontroller. The metrology engine is used in a smart metering application to collect data about energy utilization and is controlled with the use of metrology engine adjustment (calibration) parameters. The aim of this research is to develop a method which would enable the operators to find and verify the optimum parameters which would ensure the best possible accuracy. Properly adjusted (calibrated) metrology engines can then be used as a base for variety of products used in smart and intelligent environments. This paper focuses on the problems encountered in the development, partial automatisation, implementation and verification of this method. Copyright © 2015 ISA. Published by Elsevier Ltd. All rights reserved.

CD-SEM real time bias correction using reference metrology based modeling

Science.gov (United States)

Ukraintsev, V.; Banke, W.; Zagorodnev, G.; Archie, C.; Rana, N.; Pavlovsky, V.; Smirnov, V.; Briginas, I.; Katnani, A.; Vaid, A.

2018-03-01

Accuracy of patterning impacts yield, IC performance and technology time to market. Accuracy of patterning relies on optical proximity correction (OPC) models built using CD-SEM inputs and intra die critical dimension (CD) control based on CD-SEM. Sub-nanometer measurement uncertainty (MU) of CD-SEM is required for current technologies. Reported design and process related bias variation of CD-SEM is in the range of several nanometers. Reference metrology and numerical modeling are used to correct SEM. Both methods are slow to be used for real time bias correction. We report on real time CD-SEM bias correction using empirical models based on reference metrology (RM) data. Significant amount of currently untapped information (sidewall angle, corner rounding, etc.) is obtainable from SEM waveforms. Using additional RM information provided for specific technology (design rules, materials, processes) CD extraction algorithms can be pre-built and then used in real time for accurate CD extraction from regular CD-SEM images. The art and challenge of SEM modeling is in finding robust correlation between SEM waveform features and bias of CD-SEM as well as in minimizing RM inputs needed to create accurate (within the design and process space) model. The new approach was applied to improve CD-SEM accuracy of 45 nm GATE and 32 nm MET1 OPC 1D models. In both cases MU of the state of the art CD-SEM has been improved by 3x and reduced to a nanometer level. Similar approach can be applied to 2D (end of line, contours, etc.) and 3D (sidewall angle, corner rounding, etc.) cases.

Problems of metrological supply of carbon materials production

International Nuclear Information System (INIS)

Belov, G.V.; Bazilevskij, L.P.; Cherkashina, N.V.

1989-01-01

Carbon materials and products contain internal residual stresses and have an anisotropy of properties therefore special methods of tests are required to control their quality. The main metrological problems during development, production and application of carbon products are: metrological supply of production forms and records during the development of production conditions; metrological supply of quality control of the product; metrological supply of methods for the tests of products and the methods to forecast the characteristics of product quality for the period of quaranteed service life

[The EFS metrology: From the production to the reason].

Science.gov (United States)

Reifenberg, J-M; Riout, E; Leroy, A; Begue, S

2014-06-01

In order to answer statutory requirements and to anticipate the future needs and standards, the EFS is committed, since a few years, in a process of harmonization of its metrology function. In particular, the institution has opted for the skills development by internalizing the metrological traceability of the main critical quantities (temperature, volumetric) measurements. The development of metrology so resulted in a significant increase in calibration and testing activities. Methods are homogenized and improved through accreditations. The investment strategies are based on more and more demanding specifications. The performance of the equipments is better known and mastered. Technical expertise and maturity of the national metrology function today are assets to review in more informed ways the appropriateness of the applied periodicities. Analysis of numerous information and data in the calibration and testing reports could be pooled and operated on behalf of the unique establishment. The objective of this article is to illustrate these reflections with a few examples from of a feedback of the EFS Pyrénées Méditerranée. The analysis of some methods of qualification, the exploitation of the historical metrology in order to quantify the risk of non-compliance, and to adapt the control strategy, analysis of the criticality of an instrument in a measurement process, risk analyses are tools that deserve to be more widely exploited for that discipline wins in efficiency at the national level. Copyright © 2014 Elsevier Masson SAS. All rights reserved.

Metrology for WEST components design and integration optimization

International Nuclear Information System (INIS)

Brun, C.; Archambeau, G.; Blanc, L.; Bucalossi, J.; Chantant, M.; Gargiulo, L.; Hermenier, A.; Le, R.; Pilia, A.

2015-01-01

Highlights: • Metrology methods. • Interests of metrology campaign to optimize margins by reducing uncertainties. • Assembly problems are solved and validated on a numerical mock up. • Post treatment of full 3DScan of the vacuum vessel. - Abstract: On WEST new components will be implemented in an existing environment, emphasis has to be put on the metrology to optimize the design and the assembly. Hence, at a particular stage of the project, several components have to coexist in the limited vessel. Therefore, all the difficulty consists in validating the mechanical interfaces between existing components and new one; minimize the risk of the assembling and to maximize the plasma volume. The CEA/IRFM takes the opportunity of the ambitious project to sign a partnership with an industrial specialized in multipurpose metrology domains. To optimize the assembly procedure, the IRFM Assembly group works in strong collaboration with its industrial, to define and plan the campaigns of metrology. The paper will illustrate the organization, methods and results of the dedicated metrology campaigns have been defined and carried out in the WEST dis/assembly phase. To conclude, the future needs of metrology at CEA/IRFM will be exposed to define the next steps.

Frequency metrology of a photomixing source for gas phase spectroscopy

Science.gov (United States)

Hindle, Francis; Mouret, Gael; Yang, Chun; Cuisset, Arnaud; Bocquet, Robin; Lours, Michel; Rovera, Daniele

2010-08-01

The availability of frequency combs has opened new possibilities for the measurement of optical frequencies. Photomixing is an attractive solution for high resolution THz spectroscopy of gases due to the narrow spectral resolution and ability to access the 100 GHz to 3.5 THz range. One limitation of present photomixing spectrometers is the accuracy with which the THz frequency is established. Measurement of the centre frequency gas phase molecular transitions requires an accuracy better than 100 kHz in order to allow spectroscopic constants to be determined. Standard optical techniques like those employed in wavelength meters can only provide accuracies in the order of 50 MHz. We have used a turnkey fibre based frequency comb and a standard photomixing configuration to realize a THz synthesizer with an accuracy of around 50kHz. Two ECDLs used to pump the photomixer are phase locked onto the frequency comb and provide a tuning range of 10 MHz. In order to extend the tuning range an additional phase locked ECLD has been added to obtain a range in excess of 100 MHz. The absorption profiles of many Doppler limited transitions of carbonyl sulphide and formaldehyde have been measured to validate this instrument.

Dimensional micro and nano metrology

DEFF Research Database (Denmark)

Hansen, Hans Nørgaard; da Costa Carneiro, Kim; Haitjema, Han

2006-01-01

The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer these chal......The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient. Major research and development efforts have to be undertaken in order to answer...... these challenges. The developments have to include new measuring principles and instrumentation, tolerancing rules and procedures as well as traceability and calibration. The current paper describes issues and challenges in dimensional micro and nano metrology by reviewing typical measurement tasks and available...

Critical issues in overlay metrology

International Nuclear Information System (INIS)

Sullivan, Neal T.

2001-01-01

In this paper, following an overview of overlay metrology, the difficult relationship of overlay with device performance and yield is discussed and supported with several examples. This is followed by a discussion of the impending collision of metrology equipment performance and 'real' process tolerances for sub 0.18 um technologies. This convergence of tolerance and performance is demonstrated to lead to the current emergence of real-time overlay modeling in a feed-forward/feedback process environment and the associated metrology/sampling implications. This modeling takes advantage of the wealth of understanding concerning the systematic behavior of overlay registration errors. Finally, the impact of new process technologies (RET, OAI, CPSM, CMP, and etc.) on the measurement target is discussed and shown to de-stabilize overlay performance on standard overlay measurement target designs

Radioactivity metrology

International Nuclear Information System (INIS)

Legrand, J.

1979-01-01

Some aspects of the radioactivity metrology are reviewed. Radioactivity primary references; absolute methods of radioactivity measurements used in the Laboratoire de Metrologie des Rayonnements Ionisants; relative measurement methods; traceability through international comparisons and interlaboratory tests; production and distribution of secondary standards [fr

FOREWORD: Materials metrology Materials metrology

Science.gov (United States)

Bennett, Seton; Valdés, Joaquin

2010-04-01

It seems that so much of modern life is defined by the materials we use. From aircraft to architecture, from cars to communications, from microelectronics to medicine, the development of new materials and the innovative application of existing ones have underpinned the technological advances that have transformed the way we live, work and play. Recognizing the need for a sound technical basis for drafting codes of practice and specifications for advanced materials, the governments of countries of the Economic Summit (G7) and the European Commission signed a Memorandum of Understanding in 1982 to establish the Versailles Project on Advanced Materials and Standards (VAMAS). This project supports international trade by enabling scientific collaboration as a precursor to the drafting of standards. The VAMAS participants recognized the importance of agreeing a reliable, universally accepted basis for the traceability of the measurements on which standards depend for their preparation and implementation. Seeing the need to involve the wider metrology community, VAMAS approached the Comité International des Poids et Mesures (CIPM). Following discussions with NMI Directors and a workshop at the BIPM in February 2005, the CIPM decided to establish an ad hoc Working Group on the metrology applicable to the measurement of material properties. The Working Group presented its conclusions to the CIPM in October 2007 and published its final report in 2008, leading to the signature of a Memorandum of Understanding between VAMAS and the BIPM. This MoU recognizes the work that is already going on in VAMAS as well as in the Consultative Committees of the CIPM and establishes a framework for an ongoing dialogue on issues of materials metrology. The question of what is meant by traceability in the metrology of the properties of materials is particularly vexed when the measurement results depend on a specified procedure. In these cases, confidence in results requires not only traceable

Distributed large-scale dimensional metrology new insights

CERN Document Server

Franceschini, Fiorenzo; Maisano, Domenico

2011-01-01

Focuses on the latest insights into and challenges of distributed large scale dimensional metrology Enables practitioners to study distributed large scale dimensional metrology independently Includes specific examples of the development of new system prototypes

Relativistic quantum metrology: exploiting relativity to improve quantum measurement technologies.

Science.gov (United States)

Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

2014-05-22

We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects.

A Laser Metrology/Viewing System for ITER In-Vessel Inspection

International Nuclear Information System (INIS)

Spampinato, P.T.; Barry, R.E.; Chesser, J.B.; Menon, M.M.; Dagher, M.A.; Slotwinski, A.

1997-10-01

This paper identifies the requirements for a remotely operated precision laser ranging system for the International Thermonuclear Experimental Reactor. The inspection system is used for metrology and viewing, and must be capable of achieving submillimeter accuracy and operation in a reactor vessel that has high gamma radiation, high vacuum, elevated temperature, and magnetic field levels. A coherent, frequency modulated laser radar system is under development to meet these requirements. The metrology/viewing sensor consists of a compact laser-optic module linked through fiberoptics to the laser source and imaging units, located outside the harsh environment. The deployment mechanism is a remotely operated telescopic mast. Gamma irradiation up to 10 7 Gy was conducted on critical sensor components with no significant impact to data transmission, and analysis indicates that critical sensor components can operate in a magnetic field with certain design modifications. Plans for testing key components in a magnetic field are underway

The correction of vibration in frequency scanning interferometry based absolute distance measurement system for dynamic measurements

Science.gov (United States)

Lu, Cheng; Liu, Guodong; Liu, Bingguo; Chen, Fengdong; Zhuang, Zhitao; Xu, Xinke; Gan, Yu

2015-10-01

Absolute distance measurement systems are of significant interest in the field of metrology, which could improve the manufacturing efficiency and accuracy of large assemblies in fields such as aircraft construction, automotive engineering, and the production of modern windmill blades. Frequency scanning interferometry demonstrates noticeable advantages as an absolute distance measurement system which has a high precision and doesn't depend on a cooperative target. In this paper , the influence of inevitable vibration in the frequency scanning interferometry based absolute distance measurement system is analyzed. The distance spectrum is broadened as the existence of Doppler effect caused by vibration, which will bring in a measurement error more than 103 times bigger than the changes of optical path difference. In order to decrease the influence of vibration, the changes of the optical path difference are monitored by a frequency stabilized laser, which runs parallel to the frequency scanning interferometry. The experiment has verified the effectiveness of this method.

Opportunities and Risks in Semiconductor Metrology

Science.gov (United States)

Borden, Peter

2005-09-01

New metrology opportunities are constantly emerging as the semiconductor industry attempts to meet scaling requirements. The paper summarizes some of the key FEOL and BEOL needs. These must be weighed against a number of considerations to ensure that they are good opportunities for the metrology equipment supplier. The paper discusses some of these considerations.

Performances of OsO(4) stabilized CO(2) lasers as optical frequency standards near 29 THz.

Science.gov (United States)

Daussy, C; Ducos, F; Rovera, G D; Acef, O

2000-01-01

In this paper, we report on the metrological capabilities of CO (2)/OsO(4) optical frequency standards operating around 29 THz. Those frequency standards are currently involved in various fields, such as frequency metrology, high resolution spectroscopy, and Rydberg constant measurements. The most impressive features of the standards lies in the 10(-15) level frequency stability allied to a long-term reproducibility (1 yr) of 1.3x10 (-13).

7/5nm logic manufacturing capabilities and requirements of metrology

Science.gov (United States)

Bunday, Benjamin; Bello, A. F.; Solecky, Eric; Vaid, Alok

2018-03-01

This paper will provide an update to previous works [2][4][9] to our view of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic technology for foundries. First, we will review of the needs of patterned defect, critical dimensional (CD/3D), overlay and films metrology, and present the extensive list of applications for which metrology solutions are needed. We will then update the industry's progress towards addressing gating technical limits of the most important of these metrology solutions, highlighting key metrology technology gaps requiring industry attention and investment.

Slovak Office of Standards, Metrology and Testing. Annual Report 2001

International Nuclear Information System (INIS)

2002-01-01

A brief account of activities carried out by the Slovak Office of Standards, Metrology and Testing of the Slovak Republic in 2001 is presented. These activities are reported under the headings: (1) Introduction by the President of the Slovak Office of Standards, Metrology and Testing; (2) The Vice-president's Unit Standardization and Quality; (3) The President's Office; (4) Chief Inspector Department; (5) Legislative-juridical Department; (6) Department of Economy; (7) Department of International Co-operation; (8) Department of European Integration; (9) Department of Metrology; (10) Department of Testing; (11) Department of the Cyclotron Centre SR; (12) Slovak Institute of Metrology; (13) Slovak Standards Institution; (14) Slovak Metrology Inspectorate; (15) Slovak Legal Metrology; (16) Measuring Techniques - Technocentre - MTT; Abbreviations; (17) Technical Testing Institute Piestany; (18) Testing Institute of Transport and Earthmoving Machinery - SUDST

Emerging technology for astronomical optics metrology

Science.gov (United States)

Trumper, Isaac; Jannuzi, Buell T.; Kim, Dae Wook

2018-05-01

Next generation astronomical optics will enable science discoveries across all fields and impact the way we perceive the Universe in which we live. To build these systems, optical metrology tools have been developed that push the boundary of what is possible. We present a summary of a few key metrology technologies that we believe are critical for the coming generation of optical surfaces.

Neural network approximation of nonlinearity in laser nano-metrology system based on TLMI

Energy Technology Data Exchange (ETDEWEB)

Olyaee, Saeed; Hamedi, Samaneh, E-mail: s_olyaee@srttu.edu [Nano-photonics and Optoelectronics Research Laboratory (NORLab), Faculty of Electrical and Computer Engineering, Shahid Rajaee Teacher Training University (SRTTU), Lavizan, 16788, Tehran (Iran, Islamic Republic of)

2011-02-01

In this paper, an approach based on neural network (NN) for nonlinearity modeling in a nano-metrology system using three-longitudinal-mode laser heterodyne interferometer (TLMI) for length and displacement measurements is presented. We model nonlinearity errors that arise from elliptically and non-orthogonally polarized laser beams, rotational error in the alignment of laser head with respect to the polarizing beam splitter, rotational error in the alignment of the mixing polarizer, and unequal transmission coefficients in the polarizing beam splitter. Here we use a neural network algorithm based on the multi-layer perceptron (MLP) network. The simulation results show that multi-layer feed forward perceptron network is successfully applicable to real noisy interferometer signals.

Neural network approximation of nonlinearity in laser nano-metrology system based on TLMI

International Nuclear Information System (INIS)

Olyaee, Saeed; Hamedi, Samaneh

2011-01-01

In this paper, an approach based on neural network (NN) for nonlinearity modeling in a nano-metrology system using three-longitudinal-mode laser heterodyne interferometer (TLMI) for length and displacement measurements is presented. We model nonlinearity errors that arise from elliptically and non-orthogonally polarized laser beams, rotational error in the alignment of laser head with respect to the polarizing beam splitter, rotational error in the alignment of the mixing polarizer, and unequal transmission coefficients in the polarizing beam splitter. Here we use a neural network algorithm based on the multi-layer perceptron (MLP) network. The simulation results show that multi-layer feed forward perceptron network is successfully applicable to real noisy interferometer signals.

Metrology in Pharmaceutical Industry - A Case Study

International Nuclear Information System (INIS)

Yuvamoto, Priscila D.; Fermam, Ricardo K. S.; Nascimento, Elizabeth S.

2016-01-01

Metrology is recognized by improving production process, increasing the productivity, giving more reliability to the measurements and consequently, it impacts in the economy of a country. Pharmaceutical area developed GMP (Good Manufacture Practice) requeriments, with no introduction of metrological concepts. However, due to Nanomedicines, it is expected this approach and the consequent positive results. The aim of this work is to verify the level of metrology implementation in a Brazilian pharmaceutical industry, using a case study. The purpose is a better mutual comprehension by both areas, acting together and governmental support to robustness of Brazilian pharmaceutical area. (paper)

Consultative committee on ionizing radiation: Impact on radionuclide metrology

International Nuclear Information System (INIS)

Karam, L.R.; Ratel, G.

2016-01-01

In response to the CIPM MRA, and to improve radioactivity measurements in the face of advancing technologies, the CIPM's consultative committee on ionizing radiation developed a strategic approach to the realization and validation of measurement traceability for radionuclide metrology. As a consequence, measurement institutions throughout the world have devoted no small effort to establish radionuclide metrology capabilities, supported by active quality management systems and validated through prioritized participation in international comparisons, providing a varied stakeholder community with measurement confidence. - Highlights: • Influence of CIPM MRA on radionuclide metrology at laboratories around the world. • CCRI strategy: to be the “undisputed hub for ionizing radiation global metrology.” • CCRI Strategic Plan stresses importance of measurement confidence for stakeholder. • NMIs increasing role in radionuclide metrology by designating institutions (DIs). • NMIs and DIs establish quality systems; validate capabilities through comparisons.

Celtiberian metrology and its romanization

Directory of Open Access Journals (Sweden)

Leonard A. CURCHIN

2013-05-01

Full Text Available Celtiberian metrology has scarcely been investigated until now, with the exception of coin weights. On the basis of measurements of pre-Roman mud bricks, a Celtiberian foot of 24 cm is proposed. With regard to weights, we can accept a module of 9 g for silver jewelry and some bronze coins; however, loom weights do not conform to any metrological system. Over time, Roman measures of length (as indicated by the dimensions of bricks, tiles and architectural monuments and weight were adopted.

Design and industrial production of frequency standards in the USSR

Science.gov (United States)

Demidov, Nikolai A.; Uljanov, Adolph A.

1990-01-01

Some aspects of research development and production of quantum frequency standards, carried out in QUARTZ Research and Production Association (RPA), Gorky, U.S.S.R., were investigated for the last 25 to 30 years. During this period a number of rubidium and hydrogen frequency standards, based on the active maser, were developed and put into production. The first industrial model of a passive hydrogen maser was designed in the last years. Besides frequency standards for a wide application range, RPA QUARTZ investigates metrological frequency standards--cesium standards with cavity length 1.9 m and hydrogen masers with a flexible storage bulb.

Remote laboratory for phase-aided 3D microscopic imaging and metrology

Science.gov (United States)

Wang, Meng; Yin, Yongkai; Liu, Zeyi; He, Wenqi; Li, Boqun; Peng, Xiang

2014-05-01

In this paper, the establishment of a remote laboratory for phase-aided 3D microscopic imaging and metrology is presented. Proposed remote laboratory consists of three major components, including the network-based infrastructure for remote control and data management, the identity verification scheme for user authentication and management, and the local experimental system for phase-aided 3D microscopic imaging and metrology. The virtual network computer (VNC) is introduced to remotely control the 3D microscopic imaging system. Data storage and management are handled through the open source project eSciDoc. Considering the security of remote laboratory, the fingerprint is used for authentication with an optical joint transform correlation (JTC) system. The phase-aided fringe projection 3D microscope (FP-3DM), which can be remotely controlled, is employed to achieve the 3D imaging and metrology of micro objects.

World wide matching of registration metrology tools of various generations

Science.gov (United States)

Laske, F.; Pudnos, A.; Mackey, L.; Tran, P.; Higuchi, M.; Enkrich, C.; Roeth, K.-D.; Schmidt, K.-H.; Adam, D.; Bender, J.

2008-10-01

Turn around time/cycle time is a key success criterion in the semiconductor photomask business. Therefore, global mask suppliers typically allocate work loads based on fab capability and utilization capacity. From a logistical point of view, the manufacturing location of a photomask should be transparent to the customer (mask user). Matching capability of production equipment and especially metrology tools is considered a key enabler to guarantee cross site manufacturing flexibility. Toppan, with manufacturing sites in eight countries worldwide, has an on-going program to match the registration metrology systems of all its production sites. This allows for manufacturing flexibility and risk mitigation.In cooperation with Vistec Semiconductor Systems, Toppan has recently completed a program to match the Vistec LMS IPRO systems at all production sites worldwide. Vistec has developed a new software feature which allows for significantly improved matching of LMS IPRO(x) registration metrology tools of various generations. We will report on the results of the global matching campaign of several of the leading Toppan sites.

Inline temperature compensation for dimensional metrology of polymer parts in a production environment based on 3D thermomechanical analysis

DEFF Research Database (Denmark)

Sonne, M. R.; Gonzalez, D.; Costa, G. Dalla

2018-01-01

Abstract In the present work a new method for thermal compensation in dimensional metrology of polymer parts in a production environment based on 3D thermomechanical simulations is developed. A fixture for measuring the length dimension of a classical polymer part is placed in a production enviro...

Metrology for radioactive waste management. (WP2, WP3)

International Nuclear Information System (INIS)

Suran, J.

2014-01-01

The three-year European research project M etrology for Radioactive Waste Management' was launched in October 2011 under the EMRP (European Metrology Research Programme). It involves 13 European national metrology institutes and a total budget exceeds four million Euros. The project is coordinated by the Czech Metrology Institute and is divided into five working groups. In this presentation the Project is described. (author)

Clean focus, dose and CD metrology for CD uniformity improvement

Science.gov (United States)

Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Kim, Nakyoon; Robinson, John C.; Mengel, Markus; Pablo, Rovira; Yoo, Sungchul; Getin, Raphael; Choi, Dongsub; Jeon, Sanghuck

2018-03-01

Lithography process control solutions require more exacting capabilities as the semiconductor industry goes forward to the 1x nm node DRAM device manufacturing. In order to continue scaling down the device feature sizes, critical dimension (CD) uniformity requires continuous improvement to meet the required CD error budget. In this study we investigate using optical measurement technology to improve over CD-SEM methods in focus, dose, and CD. One of the key challenges is measuring scanner focus of device patterns. There are focus measurement methods based on specially designed marks on scribe-line, however, one issue of this approach is that it will report focus of scribe line which is potentially different from that of the real device pattern. In addition, scribe-line marks require additional design and troubleshooting steps that add complexity. In this study, we investigated focus measurement directly on the device pattern. Dose control is typically based on using the linear correlation behavior between dose and CD. The noise of CD measurement, based on CD-SEM for example, will not only impact the accuracy, but also will make it difficult to monitor dose signature on product wafers. In this study we will report the direct dose metrology result using an optical metrology system which especially enhances the DUV spectral coverage to improve the signal to noise ratio. CD-SEM is often used to measure CD after the lithography step. This measurement approach has the advantage of easy recipe setup as well as the flexibility to measure critical feature dimensions, however, we observe that CD-SEM metrology has limitations. In this study, we demonstrate within-field CD uniformity improvement through the extraction of clean scanner slit and scan CD behavior by using optical metrology.

8th Brazilian Congress on Metrology (Metrologia 2015)

International Nuclear Information System (INIS)

2016-01-01

THE EIGHTH BRAZILIAN CONGRESS ON METROLOGY (METROLOGIA 2015) The United Nations celebrated 2015 as the International Year of Light. By a curious coincidence, many notable events in science and technology completed a multiple of 50 or 100 years in 2015. From the pioneering work of the wise Ibn Al-Haytham in 1015, through Fresnel, Maxwell, Einstein, the discovery of the cosmic microwave background, to the use of optical fibres in communications in 1965. Electromagnetic radiation is present in our daily lives in countless applications. It is remarkable that there is no way to think about these applications without thinking of measurements. From entangled photons to more prosaic public illumination of our daily life, we are intrinsically connected all the time with the luminous phenomena. Among other things, the light allows global communication on a large scale. It strengthens the internationalization of production processes, which brings considerable changes in relations, processes and economic structures, as well as it orients the social, political and cultural behaviour of any country. These conditions of this internationalization require interchangeability of parts of complex systems, translated into strict adherence to the standards and specifications that use increasingly accurate measurement techniques, as well as the growing demand from consumer markets for products and higher quality services. They also require innovation and improvements in domestic production to boost the competitiveness of industries in domestic and foreign markets. Thus, if the Science of Measurements is taken as a serious concern, countries are better prepared to evolve towards economic and social development. In this 8"t"h edition of the Brazilian Congress on Metrology (METROLOGIA 2015), in addition to the thematic sessions in various areas of Metrology and Conformity Assessment, we hold several satellite events. They are already traditional events or highlight important current issues

Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment

International Nuclear Information System (INIS)

Maas, D. J.; Herfst, R.; Veldhoven, E. van; Fliervoet, T.; Meessen, J.; Vaenkatesan, V.; Sadeghian, H.

2015-01-01

With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension (CD) between 15 and 50 nm, as patterned in a chemically amplified resist using an ASML EUV scanner and measured at ASML and TNO. To determine the differences between various (local) CD metrology techniques, we conducted an experiment using optical scatterometry, CD-Scanning Electron Microscopy (CD-SEM), Helium ion Microscopy (HIM), and Atomic Force Microscopy (AFM). CD-SEM requires advanced beam scan strategies to mitigate sample charging; the other tools did not need that. We discuss the observed main similarities and differences between the various techniques. To this end, we assessed the spatial frequency content in the raw images for SEM, HIM, and AFM. HIM and AFM resolve the highest spatial frequencies, which are attributed to the more localized probe-sample interaction for these techniques. Furthermore, the SEM, HIM, and AFM waveforms are analyzed in detail. All techniques show good mutual correlation, albeit the reported CD values systematically differ significantly. HIM systematically reports a 25% higher CD uniformity number than CD-SEM for the same arrays of CHs, probably because HIM has a higher resolution than the CD-SEM used in this assessment. A significant speed boost for HIM and AFM is required before these techniques are to serve the demanding industrial metrology applications like optical critical dimension and CD-SEM do nowadays

Tapered amplifier laser with frequency-shifted feedback

Directory of Open Access Journals (Sweden)

A. Bayerle, S. Tzanova, P. Vlaar, B. Pasquiou, F. Schreck

2016-10-01

Full Text Available We present a frequency-shifted feedback (FSF laser based on a tapered amplifier. The laser operates as a coherent broadband source with up to 370GHz spectral width and 2.3us coherence time. If the FSF laser is seeded by a continuous-wave laser a frequency comb spanning the output spectrum appears in addition to the broadband emission. The laser has an output power of 280mW and a center wavelength of 780nm. The ease and flexibility of use of tapered amplifiers makes our FSF laser attractive for a wide range of applications, especially in metrology.

Joint Research on Scatterometry and AFM Wafer Metrology

NARCIS (Netherlands)

Bodermann, B.; Buhr, E.; Danzebrink, H.U.; Bär, M.; Scholze, F.; Krumrey, M.; Wurm, M.; Klapetek, P.; Hansen, P.E.; Korpelainen, V.; Van Veghel, M.; Yacoot, A.; Siitonen, S.; El Gawhary, O.; Burger, S.; Saastamoinen, T.

2011-01-01

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both

Beyond the GUM: variance-based sensitivity analysis in metrology

International Nuclear Information System (INIS)

Lira, I

2016-01-01

Variance-based sensitivity analysis is a well established tool for evaluating the contribution of the uncertainties in the inputs to the uncertainty in the output of a general mathematical model. While the literature on this subject is quite extensive, it has not found widespread use in metrological applications. In this article we present a succinct review of the fundamentals of sensitivity analysis, in a form that should be useful to most people familiarized with the Guide to the Expression of Uncertainty in Measurement (GUM). Through two examples, it is shown that in linear measurement models, no new knowledge is gained by using sensitivity analysis that is not already available after the terms in the so-called ‘law of propagation of uncertainties’ have been computed. However, if the model behaves non-linearly in the neighbourhood of the best estimates of the input quantities—and if these quantities are assumed to be statistically independent—sensitivity analysis is definitely advantageous for gaining insight into how they can be ranked according to their importance in establishing the uncertainty of the measurand. (paper)

La metrología en nuestras vidas

OpenAIRE

Jaramillo, Zaira

2010-01-01

A primera vista, la palabra "Metrología" nos trae a la mente la idea de condiciones meteorológicas. Nada más alejado de la realidad, porque la Meteorología es la disciplina que se encarga de estudiar las condiciones del tiempo y la Metrología se encarga de estudiar las mediciones.

Improving the surface metrology accuracy of optical profilers by using multiple measurements

Science.gov (United States)

Xu, Xudong; Huang, Qiushi; Shen, Zhengxiang; Wang, Zhanshan

2016-10-01

The performance of high-resolution optical systems is affected by small angle scattering at the mid-spatial-frequency irregularities of the optical surface. Characterizing these irregularities is, therefore, important. However, surface measurements obtained with optical profilers are influenced by additive white noise, as indicated by the heavy-tail effect observable on their power spectral density (PSD). A multiple-measurement method is used to reduce the effects of white noise by averaging individual measurements. The intensity of white noise is determined using a model based on the theoretical PSD of fractal surface measurements with additive white noise. The intensity of white noise decreases as the number of times of multiple measurements increases. Using multiple measurements also increases the highest observed spatial frequency; this increase is derived and calculated. Additionally, the accuracy obtained using multiple measurements is carefully studied, with the analysis of both the residual reference error after calibration, and the random errors appearing in the range of measured spatial frequencies. The resulting insights on the effects of white noise in optical profiler measurements and the methods to mitigate them may prove invaluable to improve the quality of surface metrology with optical profilers.

Metrological issues in molecular radiotherapy

International Nuclear Information System (INIS)

D'Arienzo, Marco; Capogni, Marco; Smyth, Vere; Cox, Maurice; Johansson, Lena; Bobin, Christophe

2014-01-01

The therapeutic effect from molecular radiation therapy (MRT), on both tumour and normal tissue, is determined by the radiation absorbed dose. Recent research indicates that as a consequence of biological variation across patients the absorbed dose can vary, for the same administered activity, by as much as two orders of magnitude. The international collaborative EURAMET-EMRP project Metrology for molecular radiotherapy (MetroMRT) is addressing this problem. The overall aim of the project is to develop methods of calibrating and verifying clinical dosimetry in MRT. In the present paper an overview of the metrological issues in molecular radiotherapy is provided. (authors)

Metrology and properties of engineering surfaces

CERN Document Server

Greenwood, J; Chetwynd, D

2001-01-01

Metrology and Properties of Engineering Surfaces provides in a single volume a comprehensive and authoritative treatment of the crucial topics involved in the metrology and properties of engineering surfaces. The subject matter is a central issue in manufacturing technology, since the quality and reliability of manufactured components depend greatly upon the selection and qualities of the appropriate materials as ascertained through measurement. The book can in broad terms be split into two parts; the first deals with the metrology of engineering surfaces and covers the important issues relating to the measurement and characterization of surfaces in both two and three dimensions. This covers topics such as filtering, power spectral densities, autocorrelation functions and the use of Fractals in topography. A significant proportion is dedicated to the calibration of scanning probe microscopes using the latest techniques. The remainder of the book deals with the properties of engineering surfaces and covers a w...

Metrology Department - DEMET

International Nuclear Information System (INIS)

1989-01-01

In this report are presented the activities and purposes of the Metrology Dept. of the Institute of Radioprotection and Dosimetry of Brazilian CNEN. It is also presented a list of services rendered by that Dept., the projects in course, personnel and publications.(J.A.M.M.)

Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Science.gov (United States)

Banke, Bill, Jr.; Archie, Charles N.; Sendelbach, Matthew; Robert, Jim; Slinkman, James A.; Kaszuba, Phil; Kontra, Rick; DeVries, Mick; Solecky, Eric P.

2004-05-01

Perhaps never before in semiconductor microlithography has there been such an interest in the accuracy of measurement. This interest places new demands on our in-line metrology systems as well as the supporting metrology for verification. This also puts a burden on the users and suppliers of new measurement tools, which both challenge and complement existing manufacturing metrology. The metrology community needs to respond to these challenges by using new methods to assess the fab metrologies. An important part of this assessment process is the ability to obtain accepted reference measurements as a way of determining the accuracy and Total Measurement Uncertainty (TMU) of an in-line critical dimension (CD). In this paper, CD can mean any critical dimension including, for example, such measures as feature height or sidewall angle. This paper describes the trade-offs of in-line metrology systems as well as the limitations of Reference Measurement Systems (RMS). Many factors influence each application such as feature shape, material properties, proximity, sampling, and critical dimension. These factors, along with the metrology probe size, interaction volume, and probe type such as e-beam, optical beam, and mechanical probe, are considered. As the size of features shrinks below 100nm some of the stalwarts of reference metrology come into question, such as the electrically determined transistor gate length. The concept of the RMS is expanded to show how multiple metrologies are needed to achieve the right balance of accuracy and sampling. This is also demonstrated for manufacturing metrology. Various comparisons of CDSEM, scatterometry, AFM, cross section SEM, electrically determined CDs, and TEM are shown. An example is given which demonstrates the importance in obtaining TMU by balancing accuracy and precision for selecting manufacturing measurement strategy and optimizing manufacturing metrology. It is also demonstrated how the necessary supporting metrology will

Characterizing opto-electret based paper speakers by using a real-time projection Moiré metrology system

Science.gov (United States)

Chang, Ya-Ling; Hsu, Kuan-Yu; Lee, Chih-Kung

2016-03-01

Advancement of distributed piezo-electret sensors and actuators facilitates various smart systems development, which include paper speakers, opto-piezo/electret bio-chips, etc. The array-based loudspeaker system possess several advantages over conventional coil speakers, such as light-weightness, flexibility, low power consumption, directivity, etc. With the understanding that the performance of the large-area piezo-electret loudspeakers or even the microfluidic biochip transport behavior could be tailored by changing their dynamic behaviors, a full-field real-time high-resolution non-contact metrology system was developed. In this paper, influence of the resonance modes and the transient vibrations of an arraybased loudspeaker system on the acoustic effect were measured by using a real-time projection moiré metrology system and microphones. To make the paper speaker even more versatile, we combine the photosensitive material TiOPc into the original electret loudspeaker. The vibration of this newly developed opto-electret loudspeaker could be manipulated by illuminating different light-intensity patterns. Trying to facilitate the tailoring process of the opto-electret loudspeaker, projection moiré was adopted to measure its vibration. By recording the projected fringes which are modulated by the contours of the testing sample, the phase unwrapping algorithm can give us a continuous phase distribution which is proportional to the object height variations. With the aid of the projection moiré metrology system, the vibrations associated with each distinctive light pattern could be characterized. Therefore, we expect that the overall acoustic performance could be improved by finding the suitable illuminating patterns. In this manuscript, the system performance of the projection moiré and the optoelectret paper speakers were cross-examined and verified by the experimental results obtained.

National Laboratory of Ionizing Radiation Metrology - Brazilian CNEN

International Nuclear Information System (INIS)

1992-01-01

The activities of the Brazilian National Laboratory of Ionizing Radiations Metrology are described. They include research and development of metrological techniques and procedures, the calibration of area radiation monitors, clinical dosemeters and other instruments and the preparation and standardization of reference radioactive sources. 4 figs., 13 tabs

Quantum metrology foundation of units and measurements

CERN Document Server

Goebel, Ernst O

2015-01-01

The International System of Units (SI) is the world's most widely used system of measurement, used every day in commerce and science, and is the modern form of the metric system. It currently comprises the meter (m), the kilogram (kg), the second (s), the ampere (A), the kelvin (K), the candela (cd) and the mole (mol)). The system is changing though, units and unit definitions are modified through international agreements as the technology of measurement progresses, and as the precision of measurements improves. The SI is now being redefined based on constants of nature and their realization by quantum standards. Therefore, the underlying physics and technologies will receive increasing interest, and not only in the metrology community but in all fields of science. This book introduces and explains the applications of modern physics concepts to metrology, the science and the applications of measurements. A special focus is made on the use of quantum standards for the realization of the forthcoming new SI (the...

Metrology for industrial quantum communications: the MIQC project

Science.gov (United States)

Rastello, M. L.; Degiovanni, I. P.; Sinclair, A. G.; Kück, S.; Chunnilall, C. J.; Porrovecchio, G.; Smid, M.; Manoocheri, F.; Ikonen, E.; Kubarsepp, T.; Stucki, D.; Hong, K. S.; Kim, S. K.; Tosi, A.; Brida, G.; Meda, A.; Piacentini, F.; Traina, P.; Natsheh, A. Al; Cheung, J. Y.; Müller, I.; Klein, R.; Vaigu, A.

2014-12-01

The ‘Metrology for Industrial Quantum Communication Technologies’ project (MIQC) is a metrology framework that fosters development and market take-up of quantum communication technologies and is aimed at achieving maximum impact for the European industry in this area. MIQC is focused on quantum key distribution (QKD) technologies, the most advanced quantum-based technology towards practical application. QKD is a way of sending cryptographic keys with absolute security. It does this by exploiting the ability to encode in a photon's degree of freedom specific quantum states that are noticeably disturbed if an eavesdropper trying to decode it is present in the communication channel. The MIQC project has started the development of independent measurement standards and definitions for the optical components of QKD system, since one of the perceived barriers to QKD market success is the lack of standardization and quality assurance.

Metrology and quality control handbook

International Nuclear Information System (INIS)

Hofmann, D.

1983-01-01

This book tries to present the fundamentals of metrology and quality control in brief surveys. Compromises had to be made in order to reduce the material available to a sensible volume for the sake of clarity. This becomes evident by the following two restrictions which had to made: First, in dealing with the theoretical principles of metrology and quality control, mere reference had to be made in many cases to the great variety of special literature without discussing it to explain further details. Second, in dealing with the application of metrology and quality control techniques in practice, only the basic qantities of the International System of Units (SI) could be taken into account as a rule. Some readers will note that many special measuring methods and equipment known to them are not included in this book. I do hope, however, that this short-coming will show to have a positive effect, too. This book will show the reader how to find the basic quantities and units from the derived quantities and units, and the steps that are necessary to solve any kind of measuring task. (orig./RW) [de

Metrology in electricity and magnetism: EURAMET activities today and tomorrow

Science.gov (United States)

Piquemal, F.; Jeckelmann, B.; Callegaro, L.; Hällström, J.; Janssen, T. J. B. M.; Melcher, J.; Rietveld, G.; Siegner, U.; Wright, P.; Zeier, M.

2017-10-01

Metrology dedicated to electricity and magnetism has changed considerably in recent years. It encompasses almost all modern scientific, industrial, and societal challenges, e.g. the revision of the International System of Units, the profound transformation of industry, changes in energy use and generation, health, and environment, as well as nanotechnologies (including graphene and 2D materials) and quantum engineering. Over the same period, driven by the globalization of worldwide trade, the Mutual Recognition Arrangement (referred to as the CIPM MRA) was set up. As a result, the regional metrology organizations (RMOs) of national metrology institutes have grown in significance. EURAMET is the European RMO and has been very prominent in developing a strategic research agenda (SRA) and has established a comprehensive research programme. This paper reviews the highlights of EURAMET in electrical metrology within the European Metrology Research Programme and its main contributions to the CIPM MRA. In 2012 EURAMET undertook an extensive roadmapping exercise for proposed activities for the next decade which will also be discussed in this paper. This work has resulted in a new SRA of the second largest European funding programme: European Metrology Programme for Innovation and Research.

Metrological Reliability of Medical Devices

Science.gov (United States)

Costa Monteiro, E.; Leon, L. F.

2015-02-01

The prominent development of health technologies of the 20th century triggered demands for metrological reliability of physiological measurements comprising physical, chemical and biological quantities, essential to ensure accurate and comparable results of clinical measurements. In the present work, aspects concerning metrological reliability in premarket and postmarket assessments of medical devices are discussed, pointing out challenges to be overcome. In addition, considering the social relevance of the biomeasurements results, Biometrological Principles to be pursued by research and innovation aimed at biomedical applications are proposed, along with the analysis of their contributions to guarantee the innovative health technologies compliance with the main ethical pillars of Bioethics.

Metrological characterization of 3D imaging devices

Science.gov (United States)

Guidi, G.

2013-04-01

Manufacturers often express the performance of a 3D imaging device in various non-uniform ways for the lack of internationally recognized standard requirements for metrological parameters able to identify the capability of capturing a real scene. For this reason several national and international organizations in the last ten years have been developing protocols for verifying such performance. Ranging from VDI/VDE 2634, published by the Association of German Engineers and oriented to the world of mechanical 3D measurements (triangulation-based devices), to the ASTM technical committee E57, working also on laser systems based on direct range detection (TOF, Phase Shift, FM-CW, flash LADAR), this paper shows the state of the art about the characterization of active range devices, with special emphasis on measurement uncertainty, accuracy and resolution. Most of these protocols are based on special objects whose shape and size are certified with a known level of accuracy. By capturing the 3D shape of such objects with a range device, a comparison between the measured points and the theoretical shape they should represent is possible. The actual deviations can be directly analyzed or some derived parameters can be obtained (e.g. angles between planes, distances between barycenters of spheres rigidly connected, frequency domain parameters, etc.). This paper shows theoretical aspects and experimental results of some novel characterization methods applied to different categories of active 3D imaging devices based on both principles of triangulation and direct range detection.

X-ray pulse wavefront metrology using speckle tracking

International Nuclear Information System (INIS)

Berujon, Sebastien; Ziegler, Eric; Cloetens, Peter

2015-01-01

The theoretical description and experimental implementation of a speckle-tracking-based instrument which permits the characterisation of X-ray pulse wavefronts. An instrument allowing the quantitative analysis of X-ray pulsed wavefronts is presented and its processing method explained. The system relies on the X-ray speckle tracking principle to accurately measure the phase gradient of the X-ray beam from which beam optical aberrations can be deduced. The key component of this instrument, a semi-transparent scintillator emitting visible light while transmitting X-rays, allows simultaneous recording of two speckle images at two different propagation distances from the X-ray source. The speckle tracking procedure for a reference-less metrology mode is described with a detailed account on the advanced processing schemes used. A method to characterize and compensate for the imaging detector distortion, whose principle is also based on speckle, is included. The presented instrument is expected to find interest at synchrotrons and at the new X-ray free-electron laser sources under development worldwide where successful exploitation of beams relies on the availability of an accurate wavefront metrology

Performance-based gear metrology kinematic, transmission, error computation and diagnosis

CERN Document Server

Mark, William D

2012-01-01

A mathematically rigorous explanation of how manufacturing deviations and damage on the working surfaces of gear teeth cause transmission-error contributions to vibration excitations Some gear-tooth working-surface manufacturing deviations of significant amplitude cause negligible vibration excitation and noise, yet others of minuscule amplitude are a source of significant vibration excitation and noise.   Presently available computer-numerically-controlled dedicated gear metrology equipment can measure such error patterns on a gear in a few hours in sufficient detail to enable

Radionuclide metrology: traceability and response to a radiological accident

Energy Technology Data Exchange (ETDEWEB)

Tauhata, L.; Cruz, P.A.L. da; Silva, C.J. da; Delgado, J.U.; Oliveira, A.E. de; Oliveira, E.M. de; Poledna, R.; Loureiro, J. dos S.; Ferreira Filho, A.L.; Silva, R.L. da; Filho, O. L.T.; Santos, A.R.L. dos; Veras, E.V. de; Rangel, J. de A.; Quadros, A.L.L.; Araújo, M.T.F. de; Souza, P.S. de; Ruzzarim, A.; Conceição, D.A. da; Iwahara, A., E-mail: palcruz@ird.gov.br [Instituto de Radioproteção e Dosimetria (LNMRI/IRD/CNEN-RJ), Rio de Janeiro, RJ (Brazil). Lab. Nacional de Metrologia das Radiações Ionizantes

2017-07-01

In the case of a radiological accident, there are characteristic phases: discovery and initial assistance with first aid; the triage and monitoring of the affected population; the release of the affected people; forward the victims to medical care; as well as the preparation of the report on the accident. In addition, studies and associated researches performed in the later period. Monitors, dosimeters and measuring systems should be calibrated by contaminating radionuclide standards. The radioactive sources used must be metrologically reliable. In Brazil, this function is performed by LNMRI/IRD/CNEN, designated by INMETRO, which Radionuclide Metrology Laboratory is responsible for the standardization and supply of radioactive sources in diverse geometries and matrices. This laboratory has a stock of radionuclide solutions with controlled environmental variables for the preparation of sources, which are calibrated and standardized by mean of primary and secondary systems. It is also responsible for the dissemination of standards and, in order to establish the metrological traceability of national standards, participates in international key-comparisons promoted by BIPM and regional metrology organizations. Internally, it promotes the National Comparison Programs for laboratories for the analysis of environmental samples and the traceability for producing centers of radiopharmaceuticals and Nuclear Medicine Services in the country. The paper presents the demand for {sup 137}Cs related to the radioactive accident in Goiania/Brazil and the significant results for the main radionuclides standardized by the Radionuclide Metrology Laboratory for international key-comparisons and national comparisons to provide metrological traceability. With the obtained results, the LNMRI of Brazil integrates the international metrology BIPM network and fulfills its function of supplying, with about a hundred of radioactive standards, the country's needs in different applications

Radionuclide metrology: traceability and response to a radiological accident

International Nuclear Information System (INIS)

Tauhata, L.; Cruz, P.A.L. da; Silva, C.J. da; Delgado, J.U.; Oliveira, A.E. de; Oliveira, E.M. de; Poledna, R.; Loureiro, J. dos S.; Ferreira Filho, A.L.; Silva, R.L. da; Filho, O. L.T.; Santos, A.R.L. dos; Veras, E.V. de; Rangel, J. de A.; Quadros, A.L.L.; Araújo, M.T.F. de; Souza, P.S. de; Ruzzarim, A.; Conceição, D.A. da; Iwahara, A.

2017-01-01

In the case of a radiological accident, there are characteristic phases: discovery and initial assistance with first aid; the triage and monitoring of the affected population; the release of the affected people; forward the victims to medical care; as well as the preparation of the report on the accident. In addition, studies and associated researches performed in the later period. Monitors, dosimeters and measuring systems should be calibrated by contaminating radionuclide standards. The radioactive sources used must be metrologically reliable. In Brazil, this function is performed by LNMRI/IRD/CNEN, designated by INMETRO, which Radionuclide Metrology Laboratory is responsible for the standardization and supply of radioactive sources in diverse geometries and matrices. This laboratory has a stock of radionuclide solutions with controlled environmental variables for the preparation of sources, which are calibrated and standardized by mean of primary and secondary systems. It is also responsible for the dissemination of standards and, in order to establish the metrological traceability of national standards, participates in international key-comparisons promoted by BIPM and regional metrology organizations. Internally, it promotes the National Comparison Programs for laboratories for the analysis of environmental samples and the traceability for producing centers of radiopharmaceuticals and Nuclear Medicine Services in the country. The paper presents the demand for 137 Cs related to the radioactive accident in Goiania/Brazil and the significant results for the main radionuclides standardized by the Radionuclide Metrology Laboratory for international key-comparisons and national comparisons to provide metrological traceability. With the obtained results, the LNMRI of Brazil integrates the international metrology BIPM network and fulfills its function of supplying, with about a hundred of radioactive standards, the country's needs in different applications

High pressure metrology for industrial applications

Science.gov (United States)

Sabuga, Wladimir; Rabault, Thierry; Wüthrich, Christian; Pražák, Dominik; Chytil, Miroslav; Brouwer, Ludwig; Ahmed, Ahmed D. S.

2017-12-01

To meet the needs of industries using high pressure technologies, in traceable, reliable and accurate pressure measurements, a joint research project of the five national metrology institutes and the university was carried out within the European Metrology Research Programme. In particular, finite element methods were established for stress-strain analysis of elastic and nonlinear elastic-plastic deformation, as well as of contact processes in pressure-measuring piston-cylinder assemblies, and high-pressure components at pressures above 1 GPa. New pressure measuring multipliers were developed and characterised, which allow realisation of the pressure scale up to 1.6 GPa. This characterisation is based on research including measurements of material elastic constants by the resonant ultrasound spectroscopy, hardness of materials of high pressure components, density and viscosity of pressure transmitting liquids at pressures up to 1.4 GPa and dimensional measurements on piston-cylinders. A 1.6 GPa pressure system was created for operation of the 1.6 GPa multipliers and calibration of high pressure transducers. A transfer standard for 1.5 GPa pressure range, based on pressure transducers, was built and tested. Herewith, the project developed the capability of measuring pressures up to 1.6 GPa, from which industrial users can calibrate their pressure measurement devices for accurate measurements up to 1.5 GPa.

European research project 'Metrology for radioactive waste management'

International Nuclear Information System (INIS)

Suran, J.

2014-01-01

The three-year European research project M etrology for Radioactive Waste Management' was launched in October 2011 under the EMRP (European Metrology Research Programme). It involves 13 European national metrology institutes and a total budget exceeds four million Euros. The project is coordinated by the Czech Metrology Institute and is divided into five working groups. This poster presents impact, excellence, relevance to EMPR objectives, and implementation and management of this project.(author)

Realization of a frequency standard at 778 nm: absolute frequency measurement of the 2S-8S/D transitions in hydrogen and deuterium and determination of the Rydberg constant; Realisation d'un etalon de frequence a 778 nm: mesure absolue des frequences 2S-8S/D des atomes d'hydrogene et de deuterium et determination de la constante de rydberg

Energy Technology Data Exchange (ETDEWEB)

Beauvoir, B. de

1996-12-15

The purpose of this work is to design a 778 nm standard laser for performing an absolute measurement of 2S-8S/D frequencies of hydrogen and deuterium atoms. This frequency calibration is based on a 5S-5D two-photon transition of the rubidium atom. Metrological performance of this laser is 10 times as good as that of He-Ne laser calibrated on iodine. It has been shown that the passage of a laser radiation through an optic fiber does not deteriorate its metrological properties. 2S-8S/8D transitions have been excited in an atomic jet by a titanium-sapphire laser. Spurious effects can shift and broaden lines. In order to prevent these effects, a theoretical line has been shaped and adjusted on experimental signals. The frequency comparison between the excitation laser and the standard laser has led to the measurement of the absolute frequency of the line concerned. The value of the Rydberg constant has been deduced: R{sub {infinity}} = 109737.3156859 (10) cm{sup -1}. The comparison of experimental data between deuterium and hydrogen has allowed us to determine the value of the Lamb shift of the 2S state of deuterium: L(2S-2P) = 1059,230 (9) MHz.

Color and appearance metrology facility

Data.gov (United States)

Federal Laboratory Consortium — The NIST Physical Measurement Laboratory has established the color and appearance metrology facility to support calibration services for 0°/45° colored samples, 20°,...

Utilization of the research and measurement reactor Braunschweig for neutron metrology

International Nuclear Information System (INIS)

Alberts, W.G.

1982-01-01

The objectives of the Physikalisch-Technische Bundesanstalt (PTB) with regard to neutron metrology are briefly described. The use of the PTB's Research and Measuring Reactor as neutron source for metrological purposes is discussed. Reference neutron beams are described which serve as irradiation facilities for the calibration of detectors for radiation protection purposes in the frame of the legal metrology work in the PTB. (orig.) [de

At-wavelength Optical Metrology Development at the ALS

International Nuclear Information System (INIS)

Yuan, Sheng Sam; Goldberg, Kenneth A.; Yashchuk, Valeriy V.; Celestre, Richard; Mochi, Iacopo; Macdougall, James; Morrison, Gregory Y.; Smith, Brian V.; Domning, Edward E.; McKinney, Wayne R.; Warwick, Tony

2010-01-01

Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

Slovak Institute of Metrology. Annual Report 2001

International Nuclear Information System (INIS)

Bily, M.

2002-03-01

A brief account of activities carried out by the Slovak Institute of Metrology (SMU) in 2001 is presented. These activities are reported under the headings: (1) Organisation identification; (2) Mission and medium-term perspectives; (3) Contract with Slovak Office of Standards, Metrology and Testing of the Slovak Republic; (4) SMU activities ; (5) Economic results; (6) Personnel management; (7) Aims and results of their fulfilment; (8) Evaluation and analysis of SMU development in 2001; (9) Main group of outputs users; (10) Conclusion

Objectives and functions of ionizing radiation metrology

International Nuclear Information System (INIS)

Rothe, H.

1981-01-01

Proceeding from the fundamental objectives of ionizing radiation metrology, the main tasks of metrological research and assurances of accurate measurements in dosimetry and activity determination are summarized. With a view to the technical performance of these tasks the state-of-the-art and the trends in reproduction and dissemination of dosimetric and activity units are outlined. Problems are derived that should be solved within the framework of the CMEA Standing Commissions on Standardization and on the Peaceful Uses of Atomic Energy. (author)

Image-based overlay and alignment metrology through optically opaque media with sub-surface probe microscopy

Science.gov (United States)

van Es, Maarten H.; Mohtashami, Abbas; Piras, Daniele; Sadeghian, Hamed

2018-03-01

Nondestructive subsurface nanoimaging through optically opaque media is considered to be extremely challenging and is essential for several semiconductor metrology applications including overlay and alignment and buried void and defect characterization. The current key challenge in overlay and alignment is the measurement of targets that are covered by optically opaque layers. Moreover, with the device dimensions moving to the smaller nodes and the issue of the so-called loading effect causing offsets between between targets and product features, it is increasingly desirable to perform alignment and overlay on product features or so-called on-cell overlay, which requires higher lateral resolution than optical methods can provide. Our recently developed technique known as SubSurface Ultrasonic Resonance Force Microscopy (SSURFM) has shown the capability for high-resolution imaging of structures below a surface based on (visco-)elasticity of the constituent materials and as such is a promising technique to perform overlay and alignment with high resolution in upcoming production nodes. In this paper, we describe the developed SSURFM technique and the experimental results on imaging buried features through various layers and the ability to detect objects with resolution below 10 nm. In summary, the experimental results show that the SSURFM is a potential solution for on-cell overlay and alignment as well as detecting buried defects or voids and generally metrology through optically opaque layers.

Target-Tracking Camera for a Metrology System

Science.gov (United States)

Liebe, Carl; Bartman, Randall; Chapsky, Jacob; Abramovici, Alexander; Brown, David

2009-01-01

An analog electronic camera that is part of a metrology system measures the varying direction to a light-emitting diode that serves as a bright point target. In the original application for which the camera was developed, the metrological system is used to determine the varying relative positions of radiating elements of an airborne synthetic aperture-radar (SAR) antenna as the airplane flexes during flight; precise knowledge of the relative positions as a function of time is needed for processing SAR readings. It has been common metrology system practice to measure the varying direction to a bright target by use of an electronic camera of the charge-coupled-device or active-pixel-sensor type. A major disadvantage of this practice arises from the necessity of reading out and digitizing the outputs from a large number of pixels and processing the resulting digital values in a computer to determine the centroid of a target: Because of the time taken by the readout, digitization, and computation, the update rate is limited to tens of hertz. In contrast, the analog nature of the present camera makes it possible to achieve an update rate of hundreds of hertz, and no computer is needed to determine the centroid. The camera is based on a position-sensitive detector (PSD), which is a rectangular photodiode with output contacts at opposite ends. PSDs are usually used in triangulation for measuring small distances. PSDs are manufactured in both one- and two-dimensional versions. Because it is very difficult to calibrate two-dimensional PSDs accurately, the focal-plane sensors used in this camera are two orthogonally mounted one-dimensional PSDs.

Research on rapid agile metrology for manufacturing based on real-time multitask operating system

Science.gov (United States)

Chen, Jihong; Song, Zhen; Yang, Daoshan; Zhou, Ji; Buckley, Shawn

1996-10-01

Rapid agile metrology for manufacturing (RAMM) using multiple non-contact sensors is likely to remain a growing trend in manufacturing. High speed inspecting systems for manufacturing is characterized by multitasks implemented in parallel and real-time events which occur simultaneously. In this paper, we introduce a real-time operating system into RAMM research. A general task model of a class-based object- oriented technology is proposed. A general multitask frame of a typical RAMM system using OPNet is discussed. Finally, an application example of a machine which inspects parts held on a carrier strip is described. With RTOS and OPNet, this machine can measure two dimensions of the contacts at 300 parts/second.

Joint Research on Scatterometry and AFM Wafer Metrology

OpenAIRE

Bodermann, B.; Buhr, E.; Danzebrink, H.U.; Bär, M.; Scholze, F.; Krumrey, M.; Wurm, M.; Klapetek, P.; Hansen, P.E.; Korpelainen, V.; Van Veghel, M.; Yacoot, A.; Siitonen, S.; El Gawhary, O.; Burger, S.

2011-01-01

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) m...

Technique for long and absolute distance measurement based on laser pulse repetition frequency sweeping

Science.gov (United States)

Castro Alves, D.; Abreu, Manuel; Cabral, A.; Jost, Michael; Rebordão, J. M.

2017-11-01

In this work we present a technique to perform long and absolute distance measurements based on mode-locked diode lasers. Using a Michelson interferometer, it is possible to produce an optical cross-correlation between laser pulses of the reference arm with the pulses from the measurement arm, adjusting externally their degree of overlap either changing the pulse repetition frequency (PRF) or the position of the reference arm mirror for two (or more) fixed frequencies. The correlation of the travelling pulses for precision distance measurements relies on ultra-short pulse durations, as the uncertainty associated to the method is dependent on the laser pulse width as well as on a highly stable PRF. Mode-locked Diode lasers are a very appealing technology for its inherent characteristics, associated to compactness, size and efficiency, constituting a positive trade-off with regard to other mode-locked laser sources. Nevertheless, main current drawback is the non-availability of frequency-stable laser diodes. The laser used is a monolithic mode-locked semiconductor quantum-dot (QD) laser. The laser PRF is locked to an external stabilized RF reference. In this work we will present some of the preliminary results and discuss the importance of the requirements related to laser PRF stability in the final metrology system accuracy.

Laser metrology and optic active control system for GAIA

Science.gov (United States)

D'Angelo, F.; Bonino, L.; Cesare, S.; Castorina, G.; Mottini, S.; Bertinetto, F.; Bisi, M.; Canuto, E.; Musso, F.

2017-11-01

The Laser Metrology and Optic Active Control (LM&OAC) program has been carried out under ESA contract with the purpose to design and validate a laser metrology system and an actuation mechanism to monitor and control at microarcsec level the stability of the Basic Angle (angle between the lines of sight of the two telescopes) of GAIA satellite. As part of the program, a breadboard (including some EQM elements) of the laser metrology and control system has been built and submitted to functional, performance and environmental tests. In the followings we describe the mission requirements, the system architecture, the breadboard design, and finally the performed validation tests. Conclusion and appraisals from this experience are also reported.

Spectroscopic metrology for isotope composition measurements and transfer standards

Science.gov (United States)

Anyangwe Nwaboh, Javis; Balslev-Harder, David; Kääriäinen, Teemu; Richmond, Craig; Manninen, Albert; Mohn, Joachim; Kiseleva, Maria; Petersen, Jan C.; Werhahn, Olav; Ebert, Volker

2017-04-01

The World Meteorological Organization (WMO) has identified greenhouse gases such as CO2, CH4 and N2O as critical for global climate monitoring. Other molecules such as CO that has an indirect effect of enhancing global warming are also monitored. WMO has stated compatibility goals for atmospheric concentration and isotope ratio measurements of these gases, e.g. 0.1 ppm for CO2 concentration measurements in the northern hemisphere and 0.01 ‰ for δ13C-CO2. For measurements of the concentration of greenhouse gases, gas analysers are typically calibrated with static gas standards e.g. traceable to the WMO scale or to the International System of Units (SI) through a national metrology institute. However, concentrations of target components, e.g. CO, in static gas standards have been observed to drift, and typically the gas matrix as well as the isotopic composition of the target component does not always reflect field gas composition, leading to deviations of the analyser response, even after calibration. The deviations are dependent on the measurement technique. To address this issue, part of the HIGHGAS (Metrology for high-impact greenhouse gases) project [1] focused on the development of optical transfer standards (OTSs) for greenhouse gases, e.g. CO2 and CO, potentially complementing gas standards. Isotope ratio mass spectrometry (IRMS) [2] is currently used to provide state-of-the-art high precision (in the 0.01 ‰ range) measurements for the isotopic composition of greenhouse gases. However, there is a need for field-deployable techniques such as optical isotope ratio spectroscopy (OIRS) that can be combined with metrological measurement methods. Within the HIGHGAS project, OIRS methods and procedures based on e.g. cavity enhanced spectroscopy (CES) and tunable diode laser absorption spectroscopy (TDLAS), matched to metrological principles have been established for the measurement of 13C/12C and 18O/16O ratios in CO2, 15N/14N ratios in N2O, and 13C/12C and 2H

At-wavelength metrology of x-ray optics at Diamond Light Source

Science.gov (United States)

Wang, Hongchang; Berujon, Sebastien; Sutter, John; Alcock, Simon G.; Sawhney, Kawal

2014-09-01

Modern, third-generation synchrotron radiation sources provide coherent and extremely bright beams of X-ray radiation. The successful exploitation of such beams depends to a significant extent on imperfections and misalignment of the optics employed on the beamlines. This issue becomes even more critical with the increasing use of active optics, and the desire to achieve diffraction-limited and coherence-preserving X-ray beams. In recent years, significant progress has been made to improve optic testing and optimization techniques, especially those using X-rays for so-called atwavelength metrology. These in-situ and at-wavelength metrology methods can be used not only to optimize the performance of X-ray optics, but also to correct and minimize the collective distortions of upstream beamline optics, including monochromators, and transmission windows. An overview of at-wavelength metrology techniques implemented at Diamond Light Source is presented, including grating interferometry and X-ray near-field speckle based techniques. Representative examples of the application of these techniques are also given, including in-situ and atwavelength calibration and optimization of: active, piezo bimorph mirrors; Kirkpatrick-Baez (KB) mirrors; and refractive optics such as compound refractive lenses.

Phase shifting white light interferometry using colour CCD for optical metrology and bio-imaging applications

Science.gov (United States)

Upputuri, Paul Kumar; Pramanik, Manojit

2018-02-01

Phase shifting white light interferometry (PSWLI) has been widely used for optical metrology applications because of their precision, reliability, and versatility. White light interferometry using monochrome CCD makes the measurement process slow for metrology applications. WLI integrated with Red-Green-Blue (RGB) CCD camera is finding imaging applications in the fields optical metrology and bio-imaging. Wavelength dependent refractive index profiles of biological samples were computed from colour white light interferograms. In recent years, whole-filed refractive index profiles of red blood cells (RBCs), onion skin, fish cornea, etc. were measured from RGB interferograms. In this paper, we discuss the bio-imaging applications of colour CCD based white light interferometry. The approach makes the measurement faster, easier, cost-effective, and even dynamic by using single fringe analysis methods, for industrial applications.

Comparison of asphere measurements by tactile and optical metrological instruments

NARCIS (Netherlands)

Bergmans, R.H.; Nieuwenkamp, H.J.; Kok, G.J.P.; Blobel, G.; Nouira, H.; Küng, A.; Baas, M.; Voert, M.J.A. te; Baer, G.; Stuerwald, S.

2015-01-01

A comparison of topography measurements of aspherical surfaces was carried out by European metrology institutes, other research institutes and a company as part of an European metrology research project. In this paper the results of this comparison are presented. Two artefacts were circulated, a

Study and operating conditions of HTS Josephson arrays for metrological application

International Nuclear Information System (INIS)

Sosso, A.; Lacquaniti, V.; Andreone, D.; Cerri, R.; Klushin, A.M.

2006-01-01

We report an experimental study of metrological properties of high-temperature superconductor arrays, made of shunted bicrystal YBCO Josephson junctions. The work is mainly based on a direct comparison against a low temperature array. Owing to the high sensitivity of the measurements, we observed at nanovolt level the changes in the HTS array voltage on a step. A precise estimate of the dependence of the HTS array step width on operating conditions was obtained. Differences were observed with respect to the results of low sensitivity techniques, confirming that our method is necessary in the study of HTS arrays for metrology. The high sensitivity analysis was also applied in the derivation of the temperature dependence of the critical current, providing insights on the behavior of the HTS array

A new approach to stitching optical metrology data

Science.gov (United States)

King, Christopher W.

The next generation of optical instruments, including telescopes and imaging apparatus, will generate an increased requirement for larger and more complex optical forms. A major limiting factor for the production of such optical components is the metrology: how do we measure such parts and with respect to what reference datum This metrology can be thought of as part of a complete cycle in the production of optical components and it is currently the most challenging aspect of production. This thesis investigates a new and complete approach to stitching optical metrology data to extend the effective aperture or, in future, the dynamic range of optical metrology instruments. A practical approach is used to build up a complete process for stitching on piano and spherical parts. The work forms a basis upon which a stitching system for aspheres might be developed in the future, which is inherently more complicated. Beginning with a historical perspective and a review of optical polishing and metrology, the work presented relates the commercially available metrology instruments to the stitching process developed. The stitching is then performed by a numerical optimization routine that seeks to join together overlapping sub-aperture measurements by consideration of the aberrations introduced by the measurement scenario, and by the overlap areas between measurements. The stitching is part of a larger project, the PPARC Optical Manipulation and Metrology project, and was to benefit from new wavefront sensing technology developed by a project partner, and to be used for the sub-aperture measurement. Difficult mathematical problems meant that such a wavefront sensor was not avail able for this work and a work-around was therefore developed using commercial instruments. The techniques developed can be adapted to work on commercial ma chine platforms, and in partuicular, the OMAM NPL/UCL swing-arm profilometer described in chapter 5, or the computer controlled polishing machines

TSOM method for semiconductor metrology

Science.gov (United States)

Attota, Ravikiran; Dixson, Ronald G.; Kramar, John A.; Potzick, James E.; Vladár, András E.; Bunday, Benjamin; Novak, Erik; Rudack, Andrew

2011-03-01

Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement sensitivity using conventional optical microscopes; measurement sensitivities are comparable to what is typical when using scatterometry, scanning electron microscopy (SEM), and atomic force microscopy (AFM). TSOM can be used in both reflection and transmission modes and is applicable to a variety of target materials and shapes. Nanometrology applications that have been demonstrated by experiments or simulations include defect analysis, inspection and process control; critical dimension, photomask, overlay, nanoparticle, thin film, and 3D interconnect metrologies; line-edge roughness measurements; and nanoscale movements of parts in MEMS/NEMS. Industries that could benefit include semiconductor, data storage, photonics, biotechnology, and nanomanufacturing. TSOM is relatively simple and inexpensive, has a high throughput, and provides nanoscale sensitivity for 3D measurements with potentially significant savings and yield improvements in manufacturing.

EQ-10 electrodeless Z-pinch EUV source for metrology applications

Science.gov (United States)

Gustafson, Deborah; Horne, Stephen F.; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2011-11-01

With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

Neutron metrology in the HFR

International Nuclear Information System (INIS)

Kraakman, R.; Voorbraak, W.P.

1993-04-01

Additional to the in-core EXOTIC experiments, six irradiations of ceramic material, R212-001 to R212-006, have been performed in the PSF of the HFR. This note presents the neutron metrology results for these irradiations. (orig.)

Interoperability: linking design and tolerancing with metrology.

Science.gov (United States)

Morse, Edward; Heysiattalab, Saeed; Barnard-Feeney, Allison; Hedberg, Thomas

2016-01-01

On October 30, 2014 the American National Standards Institute (ANSI) approved QIF v 2.0 (Quality Information Framework, version 2.0) as an American National Standard. Subsequently in early 2016 QIF version 2.1 was approved. This paper describes how the QIF standard models the information necessary for quality workflow across the full metrology enterprise. After a brief description of the XML 'language' used in the standard, the paper reports on how the standard enables information exchange among four major activities in the metrology enterprise (product definition; measurement planning; measurement execution; and the analysis and reporting of the quality data).

Enhacement of intrafield overlay using a design based metrology system

Science.gov (United States)

Jo, Gyoyeon; Ji, Sunkeun; Kim, Shinyoung; Kang, Hyunwoo; Park, Minwoo; Kim, Sangwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Maruyama, Kotaro; Park, Byungjun

2016-03-01

As the scales of the semiconductor devices continue to shrink, accurate measurement and control of the overlay have been emphasized for securing more overlay margin. Conventional overlay analysis methods are based on the optical measurement of the overlay mark. However, the overlay data obtained from these optical methods cannot represent the exact misregistration between two layers at the circuit level. The overlay mismatch may arise from the size or pitch difference between the overlay mark and the real pattern. Pattern distortion, caused by CMP or etching, could be a source of the overlay mismatch as well. Another issue is the overlay variation in the real circuit pattern which varies depending on its location. The optical overlay measurement methods, such as IBO and DBO that use overlay mark on the scribeline, are not capable of defining the exact overlay values of the real circuit. Therefore, the overlay values of the real circuit need to be extracted to integrate the semiconductor device properly. The circuit level overlay measurement using CDSEM is time-consuming in extracting enough data to indicate overall trend of the chip. However DBM tool is able to derive sufficient data to display overlay tendency of the real circuit region with high repeatability. An E-beam based DBM(Design Based Metrology) tool can be an alternative overlay measurement method. In this paper, we are going to certify that the overlay values extracted from optical measurement cannot represent the circuit level overlay values. We will also demonstrate the possibility to correct misregistration between two layers using the overlay data obtained from the DBM system.

Aerosol metrology: aerodynamic and electrostatic techniques

International Nuclear Information System (INIS)

Prodi, V.

1988-01-01

Aerosols play an ever increasing role in science, engineering and especially in industrial and environmental hygiene. They are being studied since a long time, but only recently the progress in aerosol instrumentation has made it possible to pose of aerosol metrology, especially the problem of absolute measurements, as based directly on measurements of fundamental quantities. On the basis of absolute measurements, the hierarchy of standards can be prepared and adequately disseminated. In the aerosol field, the quantities to be measured are mainly size, charge, density, and shape. In this paper a possible standardisation framework for aerosols is proposed, for the main physical quantities

Metrology for Grayscale Lithography

International Nuclear Information System (INIS)

Murali, Raghunath

2007-01-01

Three dimensional microstructures find applications in diffractive optical elements, photonic elements, etc. and can be efficiently fabricated by grayscale lithography. Good process control is important for achieving the desired structures. Metrology methods for grayscale lithography are discussed. Process optimization for grayscale e-beam lithography is explored and various process parameters that affect the grayscale process are discussed

The cell pattern correction through design-based metrology

Science.gov (United States)

Kim, Yonghyeon; Lee, Kweonjae; Chang, Jinman; Kim, Taeheon; Han, Daehan; Lee, Kyusun; Hong, Aeran; Kang, Jinyoung; Choi, Bumjin; Lee, Joosung; Yeom, Kyehee; Lee, Jooyoung; Hong, Hyeongsun; Lee, Kyupil; Jin, Gyoyoung

2015-03-01

Starting with the sub 2Xnm node, the process window becomes smaller and tighter than before. Pattern related error budget is required for accurate critical-dimension control of Cell layers. Therefore, lithography has been faced with its various difficulties, such as weird distribution, overlay error, patterning difficulty etc. The distribution of cell pattern and overlay management are the most important factors in DRAM field. We had been experiencing that the fatal risk is caused by the patterns located in the tail of the distribution. The overlay also induces the various defect sources and misalignment issues. Even though we knew that these elements are important, we could not classify the defect type of Cell patterns. Because there is no way to gather massive small pattern CD samples in cell unit block and to compare layout with cell patterns by the CD-SEM. The CD- SEM is used in order to gather these data through high resolution, but CD-SEM takes long time to inspect and extract data because it measures the small FOV. (Field Of View) However, the NGR(E-beam tool) provides high speed with large FOV and high resolution. Also, it's possible to measure an accurate overlay between the target layout and cell patterns because they provide DBM. (Design Based Metrology) By using massive measured data, we extract the result that it is persuasive by applying the various analysis techniques, as cell distribution and defects, the pattern overlay error correction etc. We introduce how to correct cell pattern, by using the DBM measurement, and new analysis methods.

5th Conference on Advanced Mathematical and Computational Tools in Metrology

CERN Document Server

Cox, M G; Filipe, E; Pavese, F; Richter, D

2001-01-01

Advances in metrology depend on improvements in scientific and technical knowledge and in instrumentation quality, as well as on better use of advanced mathematical tools and development of new ones. In this volume, scientists from both the mathematical and the metrological fields exchange their experiences. Industrial sectors, such as instrumentation and software, will benefit from this exchange, since metrology has a high impact on the overall quality of industrial products, and applied mathematics is becoming more and more important in industrial processes.This book is of interest to people

Preface: The 5th International Workshop on X-ray Mirror Design, Fabrication, and Metrology

Energy Technology Data Exchange (ETDEWEB)

Assoufid, Lahsen [Argonne National Laboratory, 9700 South Cass Avenue, Lemont, Illinois 60439 (United States); Goldberg, Kenneth; Yashchuk, Valeriy V. [Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)

2016-05-15

Recent developments in synchrotron storage rings and free-electron laser-based x-ray sources with ever-increasing brightness and coherent flux have pushed x-ray optics requirements to new frontiers. This Special Topic gathers a set of articles derived from a subset of the key presentations of the International Workshop on X-ray Mirrors Fabrication (IWXM-2015) and Metrology held at Lawrence Berkley National Laboratory, Berkeley, California, USA, July 14–16, 2015. The workshop objective was to report on recent progress in x-ray synchrotron radiation mirrors fabrication as well as on new developments in related metrology tools and methods.

Efficiency improvements of offline metrology job creation

Science.gov (United States)

Zuniga, Victor J.; Carlson, Alan; Podlesny, John C.; Knutrud, Paul C.

1999-06-01

Progress of the first lot of a new design through the production line is watched very closely. All performance metrics, cycle-time, in-line measurement results and final electrical performance are critical. Rapid movement of this lot through the line has serious time-to-market implications. Having this material waiting at a metrology operation for an engineer to create a measurement job plan wastes valuable turnaround time. Further, efficient use of a metrology system is compromised by the time required to create and maintain these measurement job plans. Thus, having a method to develop metrology job plans prior to the actual running of the material through the manufacture area can significantly improve both cycle time and overall equipment efficiency. Motorola and Schlumberger have worked together to develop and test such a system. The Remote Job Generator (RJG) created job plans for new device sin a manufacturing process from an NT host or workstation, offline. This increases available system tim effort making production measurements, decreases turnaround time on job plan creation and editing, and improves consistency across job plans. Most importantly this allows job plans for new devices to be available before the first wafers of the device arrive at the tool for measurement. The software also includes a database manager which allows updates of existing job plans to incorporate measurement changes required by process changes or measurement optimization. This paper will review the result of productivity enhancements through the increased metrology utilization and decreased cycle time associated with the use of RJG. Finally, improvements in process control through better control of Job Plans across different devices and layers will be discussed.

Fundamental performance determining factors of the ultrahigh-precision space-borne optical metrology system for the LISA Pathfinder mission

Science.gov (United States)

Hechenblaikner, Gerald; Flatscher, Reinhold

2013-05-01

The LISA Pathfinder mission to space employs an optical metrology system (OMS) at its core to measure the distance and attitude between two freely floating test-masses to picometer and nanorad accuracy, respectively, within the measurement band of [1 mHz, 30 mHz]. The OMS is based upon an ultra-stable optical bench with 4 heterodyne interferometers from which interference signals are read-out and processed by a digital phase-meter. Laser frequency noise, power fluctuations and optical path-length variations are suppressed to uncritical levels by dedicated control loops so that the measurement performance approaches the sensor limit imposed by the phasemeter. The system design is such that low frequency common mode noise which affects the read-out phase of all four interferometers is generally well suppressed by subtraction of a reference phase from the other interferometer signals. However, high frequency noise directly affects measurement performance and its common mode rejection depends strongly on the relative signal phases. We discuss how the data from recent test campaigns point towards high frequency phase noise as a likely performance limiting factor which explains some important performance features.

Simulation-based artifact correction (SBAC) for metrological computed tomography

Science.gov (United States)

Maier, Joscha; Leinweber, Carsten; Sawall, Stefan; Stoschus, Henning; Ballach, Frederic; Müller, Tobias; Hammer, Michael; Christoph, Ralf; Kachelrieß, Marc

2017-06-01

Computed tomography (CT) is a valuable tool for the metrolocical assessment of industrial components. However, the application of CT to the investigation of highly attenuating objects or multi-material components is often restricted by the presence of CT artifacts caused by beam hardening, x-ray scatter, off-focal radiation, partial volume effects or the cone-beam reconstruction itself. In order to overcome this limitation, this paper proposes an approach to calculate a correction term that compensates for the contribution of artifacts and thus enables an appropriate assessment of these components using CT. Therefore, we make use of computer simulations of the CT measurement process. Based on an appropriate model of the object, e.g. an initial reconstruction or a CAD model, two simulations are carried out. One simulation considers all physical effects that cause artifacts using dedicated analytic methods as well as Monte Carlo-based models. The other one represents an ideal CT measurement i.e. a measurement in parallel beam geometry with a monochromatic, point-like x-ray source and no x-ray scattering. Thus, the difference between these simulations is an estimate for the present artifacts and can be used to correct the acquired projection data or the corresponding CT reconstruction, respectively. The performance of the proposed approach is evaluated using simulated as well as measured data of single and multi-material components. Our approach yields CT reconstructions that are nearly free of artifacts and thereby clearly outperforms commonly used artifact reduction algorithms in terms of image quality. A comparison against tactile reference measurements demonstrates the ability of the proposed approach to increase the accuracy of the metrological assessment significantly.

Dimensional quality control of Ti-Ni dental file by optical coordinate metrology and computed tomography

DEFF Research Database (Denmark)

Yagüe-Fabra, J.A.; Tosello, Guido; Ontiveros, S.

2014-01-01

Endodontic dental files usually present complex 3D geometries, which make the complete measurement of the component very challenging with conventional micro metrology tools. Computed Tomography (CT) can represent a suitable alternative solution to micro metrology tools based on optical and tactile...... techniques. However, the establishment of CT systems traceability when measuring 3D complex geometries is still an open issue. In this work, to verify the quality of the CT dimensional measurements, the dental file has been measured both with a μCT system and an optical CMM (OCMM). The uncertainty...

Metrology in CNEN NN 3.05/13 standard

International Nuclear Information System (INIS)

Mello, Marina Santiago de

2014-01-01

The nuclear medicine exams are widely used tools in health services for a reliable clinical and functional diagnosis of a disease. In Brazil, the National Nuclear Energy Commission, through the norm CNEN-NN 3:05/13, provides for the requirements of safety and radiological protection in nuclear medicine services. The objective of this review article was to emphasize the importance of metrology in compliance with this norm. We observed that metrology plays a vital role as it ensures the quality, accuracy, reproducibility and consistency of the measurements in the field of nuclear medicine. (author)

Improving automated 3D reconstruction methods via vision metrology

Science.gov (United States)

Toschi, Isabella; Nocerino, Erica; Hess, Mona; Menna, Fabio; Sargeant, Ben; MacDonald, Lindsay; Remondino, Fabio; Robson, Stuart

2015-05-01

This paper aims to provide a procedure for improving automated 3D reconstruction methods via vision metrology. The 3D reconstruction problem is generally addressed using two different approaches. On the one hand, vision metrology (VM) systems try to accurately derive 3D coordinates of few sparse object points for industrial measurement and inspection applications; on the other, recent dense image matching (DIM) algorithms are designed to produce dense point clouds for surface representations and analyses. This paper strives to demonstrate a step towards narrowing the gap between traditional VM and DIM approaches. Efforts are therefore intended to (i) test the metric performance of the automated photogrammetric 3D reconstruction procedure, (ii) enhance the accuracy of the final results and (iii) obtain statistical indicators of the quality achieved in the orientation step. VM tools are exploited to integrate their main functionalities (centroid measurement, photogrammetric network adjustment, precision assessment, etc.) into the pipeline of 3D dense reconstruction. Finally, geometric analyses and accuracy evaluations are performed on the raw output of the matching (i.e. the point clouds) by adopting a metrological approach. The latter is based on the use of known geometric shapes and quality parameters derived from VDI/VDE guidelines. Tests are carried out by imaging the calibrated Portable Metric Test Object, designed and built at University College London (UCL), UK. It allows assessment of the performance of the image orientation and matching procedures within a typical industrial scenario, characterised by poor texture and known 3D/2D shapes.

Application of virtual distances methodology to laser tracker verification with an indexed metrology platform

International Nuclear Information System (INIS)

Acero, R; Pueo, M; Santolaria, J; Aguilar, J J; Brau, A

2015-01-01

High-range measuring equipment like laser trackers need large dimension calibrated reference artifacts in their calibration and verification procedures. In this paper, a new verification procedure for portable coordinate measuring instruments based on the generation and evaluation of virtual distances with an indexed metrology platform is developed. This methodology enables the definition of an unlimited number of reference distances without materializing them in a physical gauge to be used as a reference. The generation of the virtual points and reference lengths derived is linked to the concept of the indexed metrology platform and the knowledge of the relative position and orientation of its upper and lower platforms with high accuracy. It is the measuring instrument together with the indexed metrology platform one that remains still, rotating the virtual mesh around them. As a first step, the virtual distances technique is applied to a laser tracker in this work. The experimental verification procedure of the laser tracker with virtual distances is simulated and further compared with the conventional verification procedure of the laser tracker with the indexed metrology platform. The results obtained in terms of volumetric performance of the laser tracker proved the suitability of the virtual distances methodology in calibration and verification procedures for portable coordinate measuring instruments, broadening and expanding the possibilities for the definition of reference distances in these procedures. (paper)

Application of virtual distances methodology to laser tracker verification with an indexed metrology platform

Science.gov (United States)

Acero, R.; Santolaria, J.; Pueo, M.; Aguilar, J. J.; Brau, A.

2015-11-01

High-range measuring equipment like laser trackers need large dimension calibrated reference artifacts in their calibration and verification procedures. In this paper, a new verification procedure for portable coordinate measuring instruments based on the generation and evaluation of virtual distances with an indexed metrology platform is developed. This methodology enables the definition of an unlimited number of reference distances without materializing them in a physical gauge to be used as a reference. The generation of the virtual points and reference lengths derived is linked to the concept of the indexed metrology platform and the knowledge of the relative position and orientation of its upper and lower platforms with high accuracy. It is the measuring instrument together with the indexed metrology platform one that remains still, rotating the virtual mesh around them. As a first step, the virtual distances technique is applied to a laser tracker in this work. The experimental verification procedure of the laser tracker with virtual distances is simulated and further compared with the conventional verification procedure of the laser tracker with the indexed metrology platform. The results obtained in terms of volumetric performance of the laser tracker proved the suitability of the virtual distances methodology in calibration and verification procedures for portable coordinate measuring instruments, broadening and expanding the possibilities for the definition of reference distances in these procedures.

The Remarkable Metrological History of Radiocarbon Dating [II].

Science.gov (United States)

Currie, Lloyd A

2004-01-01

This article traces the metrological history of radiocarbon, from the initial breakthrough devised by Libby, to minor (evolutionary) and major (revolutionary) advances that have brought (14)C measurement from a crude, bulk [8 g carbon] dating tool, to a refined probe for dating tiny amounts of precious artifacts, and for "molecular dating" at the 10 µg to 100 µg level. The metrological advances led to opportunities and surprises, such as the non-monotonic dendrochronological calibration curve and the "bomb effect," that gave rise to new multidisciplinary areas of application, ranging from archaeology and anthropology to cosmic ray physics to oceanography to apportionment of anthropogenic pollutants to the reconstruction of environmental history. Beyond the specific topic of natural (14)C, it is hoped that this account may serve as a metaphor for young scientists, illustrating that just when a scientific discipline may appear to be approaching maturity, unanticipated metrological advances in their own chosen fields, and unanticipated anthropogenic or natural chemical events in the environment, can spawn new areas of research having exciting theoretical and practical implications.

DABAM: an open-source database of X-ray mirrors metrology

Energy Technology Data Exchange (ETDEWEB)

Sanchez del Rio, Manuel, E-mail: srio@esrf.eu [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Bianchi, Davide [AC2T Research GmbH, Viktro-Kaplan-Strasse 2-C, 2700 Wiener Neustadt (Austria); Cocco, Daniele [SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, CA 94025 (United States); Glass, Mark [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Idir, Mourad [NSLS II, Brookhaven National Laboratory, Upton, NY 11973-5000 (United States); Metz, Jim [InSync Inc., 2511C Broadbent Parkway, Albuquerque, NM 87107 (United States); Raimondi, Lorenzo; Rebuffi, Luca [Elettra-Sincrotrone Trieste SCpA, Basovizza (TS) (Italy); Reininger, Ruben; Shi, Xianbo [Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439 (United States); Siewert, Frank [BESSY II, Helmholtz Zentrum Berlin, Institute for Nanometre Optics and Technology, Albert-Einstein-Strasse 15, 12489 Berlin (Germany); Spielmann-Jaeggi, Sibylle [Swiss Light Source at Paul Scherrer Institut, CH-5232 Villigen PSI (Switzerland); Takacs, Peter [Instrumentation Division, Brookhaven National Laboratory, Upton, NY 11973-5000 (United States); Tomasset, Muriel [Synchrotron Soleil (France); Tonnessen, Tom [InSync Inc., 2511C Broadbent Parkway, Albuquerque, NM 87107 (United States); Vivo, Amparo [ESRF - The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble (France); Yashchuk, Valeriy [Advanced Light Source, Lawrence Berkeley National Laboratory, MS 15-R0317, 1 Cyclotron Road, Berkeley, CA 94720-8199 (United States)

2016-04-20

DABAM, an open-source database of X-ray mirrors metrology to be used with ray-tracing and wave-propagation codes for simulating the effect of the surface errors on the performance of a synchrotron radiation beamline. An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper, with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.

Machine tool metrology an industrial handbook

CERN Document Server

Smith, Graham T

2016-01-01

Maximizing reader insights into the key scientific disciplines of Machine Tool Metrology, this text will prove useful for the industrial-practitioner and those interested in the operation of machine tools. Within this current level of industrial-content, this book incorporates significant usage of the existing published literature and valid information obtained from a wide-spectrum of manufacturers of plant, equipment and instrumentation before putting forward novel ideas and methodologies. Providing easy to understand bullet points and lucid descriptions of metrological and calibration subjects, this book aids reader understanding of the topics discussed whilst adding a voluminous-amount of footnotes utilised throughout all of the chapters, which adds some additional detail to the subject. Featuring an extensive amount of photographic-support, this book will serve as a key reference text for all those involved in the field. .

Coordinate Metrology by Traceable Computed Tomography

DEFF Research Database (Denmark)

Müller, Pavel

is an important factor for decision making about manufactured parts. However, due to many influences in CT, estimation of the uncertainty is a challenge, also because standardized procedures and guidelines are not available yet. In this thesis, several methods for uncertainty estimation were applied in connection......, characterization and correction of measurement errors in the CT volume. Their application appeared to be suitable for this task. Because the two objects consist of ruby spheres and carbon fibre, CT scans did not produce image artifacts, and evaluation of sphere-to-sphere distances was robust. Several methods...... metrology and coordinate metrology and is currently becoming more and more important measuring technique for dimensional measurements. This is mainly due to the fact that with CT, a complete three-dimensional model of the scanned part is in a relatively short time visualized using a computer...

Development of a metrology method for composition and thickness of barium strontium titanate thin films

International Nuclear Information System (INIS)

Remmel, Thomas; Werho, Dennis; Liu, Ran; Chu, Peir

1998-01-01

Thin films of barium strontium titanate (BST) are being investigated as the charge storage dielectric in advanced memory devices, due to their promise for high dielectric constant. Since the capacitance of BST films is a function of both stoichiometry and thickness, implementation into manufacturing requires precise metrology methods to monitor both of these properties. This is no small challenge, considering the BST film thicknesses are 60 nm or less. A metrology method was developed based on X-ray Fluorescence and applied to the measurement of stoichiometry and thickness of BST thin films in a variety of applications

Two-Stage System Based on a Software-Defined Radio for Stabilizing of Optical Frequency Combs in Long-Term Experiments

Directory of Open Access Journals (Sweden)

Martin Čížek

2014-01-01

Full Text Available A passive optical resonator is a special sensor used for measurement of lengths on the nanometer and sub-nanometer scale. A stabilized optical frequency comb can provide an ultimate reference for measuring the wavelength of a tunable laser locked to the optical resonator. If we lock the repetition and offset frequencies of the comb to a high-grade radiofrequency (RF oscillator its relative frequency stability is transferred from the RF to the optical frequency domain. Experiments in the field of precise length metrology of low-expansion materials are usually of long-term nature so it is required that the optical frequency comb stay in operation for an extended period of time. The optoelectronic closed-loop systems used for stabilization of combs are usually based on traditional analog electronic circuits processing signals from photodetectors. From an experimental point of view, these setups are very complicated and sensitive to ambient conditions, especially in the optical part, therefore maintaining long-time operation is not easy. The research presented in this paper deals with a novel approach based on digital signal processing and a software-defined radio. We describe digital signal processing algorithms intended for keeping the femtosecond optical comb in a long-time stable operation. This need arose during specialized experiments involving measurements of optical frequencies of tunable continuous-wave lasers. The resulting system is capable of keeping the comb in lock for an extensive period of time (8 days or more with the relative stability better than 1.6 × 10−11.

Metrology and analytical chemistry: Bridging the cultural gap

International Nuclear Information System (INIS)

King, Bernard

2002-01-01

Metrology in general and issues such as traceability and measurement uncertainty in particular are new to most analytical chemists and many remain to be convinced of their value. There is a danger of the cultural gap between metrologists and analytical chemists widening with unhelpful consequences and it is important that greater collaboration and cross-fertilisation is encouraged. This paper discusses some of the similarities and differences in the approaches adopted by metrologists and analytical chemists and indicates how these approaches can be combined to establish a unique metrology of chemical measurement which could be accepted by both cultures. (author)

Enabling CD SEM metrology for 5nm technology node and beyond

Science.gov (United States)

Lorusso, Gian Francesco; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Bömmels, Jürgen; Wilson, Christopher J.; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnémont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru

2017-03-01

The CD SEM (Critical Dimension Scanning Electron Microscope) is one of the main tools used to estimate Critical Dimension (CD) in semiconductor manufacturing nowadays, but, as all metrology tools, it will face considerable challenges to keep up with the requirements of the future technology nodes. The root causes of these challenges are not uniquely related to the shrinking CD values, as one might expect, but to the increase in complexity of the devices in terms of morphology and chemical composition as well. In fact, complicated threedimensional device architectures, high aspect ratio features, and wide variety of materials are some of the unavoidable characteristics of the future metrology nodes. This means that, beside an improvement in resolution, it is critical to develop a CD SEM metrology capable of satisfying the specific needs of the devices of the nodes to come, needs that sometimes will have to be addressed through dramatic changes in approach with respect to traditional CD SEM metrology. In this paper, we report on the development of advanced CD SEM metrology at imec on a variety of device platform and processes, for both logic and memories. We discuss newly developed approaches for standard, IIIV, and germanium FinFETs (Fin Field Effect Transistors), for lateral and vertical nanowires (NW), 3D NAND (three-dimensional NAND), STT-MRAM (Spin Transfer Magnetic Torque Random-Access Memory), and ReRAM (Resistive Random Access Memory). Applications for both front-end of line (FEOL) and back-end of line (BEOL) are developed. In terms of process, S/D Epi (Source Drain Epitaxy), SAQP (Self-Aligned Quadruple Patterning), DSA (Dynamic Self-Assembly), and EUVL (Extreme Ultraviolet Lithography) have been used. The work reported here has been performed on Hitachi CG5000, CG6300, and CV5000. In terms of logic, we discuss here the S/D epi defect classification, the metrology optimization for STI (Shallow Trench Isolation) Ge FinFETs, the defectivity of III-V STI Fin

Efficient frequency comb generation in AlGaAs-on-insulator

DEFF Research Database (Denmark)

Pu, Minhao; Ottaviano, Luisa; Semenova, Elizaveta

2016-01-01

The combination of nonlinear and integrated photonics enables Kerr frequency comb generation in stable chip-based microresonators. Such a comb system will revolutionize applications, including multi-wavelength lasers, metrology, and spectroscopy. Aluminum gallium arsenide (AlGaAs) exhibits very...... high material nonlinearity and low nonlinear loss. However, difficulties in device processing and low device effective nonlinearity made Kerr frequency comb generation elusive. Here, we demonstrate AlGaAs-on-insulator as a nonlinear platform at telecom wavelengths with an ultra-high device nonlinearity....... We show high-quality-factor (Q > 105) micro-resonators where optical parametric oscillations are achieved with milliwatt-level pump threshold powers, which paves the way for on-chip pumped comb generation....

Automation of testing the metrological reliability of nondestructive control systems

International Nuclear Information System (INIS)

Zhukov, Yu.A.; Isakov, V.B.; Karlov, Yu.K.; Kovalevskij, Yu.A.

1987-01-01

Opportunities of microcomputers are used to solve the problem of testing control-measuring systems. Besides the main program the program of data processing when characterizing the nondestructive control systems is written in the microcomputer. The program includes two modules. The first module contains tests-programs, by which accuracy of functional elements of the microcomputer and interface elements with issuing a message to the operator on readiness of the elements for operation and failure of a certain element are determined. The second module includes: calculational programs when determining metrological reliability of measuring channel reliability, a calculational subprogram for random statistical measuring error, time instability and ''dead time''. Automation of testing metrological reliability of the nondestructive control systems increases reliability of determining metrological parameters and reduces time of system testing

Surface slope metrology of highly curved x-ray optics with an interferometric microscope

Science.gov (United States)

Gevorkyan, Gevork S.; Centers, Gary; Polonska, Kateryna S.; Nikitin, Sergey M.; Lacey, Ian; Yashchuk, Valeriy V.

2017-09-01

The development of deterministic polishing techniques has given rise to vendors that manufacture high quality threedimensional x-ray optics. The surface metrology on these optics remains a difficult task. For the fabrication, vendors usually use unique surface metrology tools, generally developed on site, that are not available in the optical metrology labs at x-ray facilities. At the Advanced Light Source X-Ray Optics Laboratory, we have developed a rather straightforward interferometric-microscopy-based procedure capable of sub microradian characterization of sagittal slope variation of x-ray optics for two-dimensionally focusing and collimating (such as ellipsoids, paraboloids, etc.). In the paper, we provide the mathematical foundation of the procedure and describe the related instrument calibration. We also present analytical expression describing the ideal surface shape in the sagittal direction of a spheroid specified by the conjugate parameters of the optic's beamline application. The expression is useful when analyzing data obtained with such optics. The high efficiency of the developed measurement and data analysis procedures is demonstrated in results of measurements with a number of x-ray optics with sagittal radius of curvature between 56 mm and 480 mm. We also discuss potential areas of further improvement.

Picometre and nanoradian heterodyne interferometry and its application in dilatometry and surface metrology

International Nuclear Information System (INIS)

Schuldt, T; Kögel, H; Spannagel, R; Braxmaier, C; Gohlke, M; Peters, A; Johann, U; Weise, D

2012-01-01

A high-sensitivity heterodyne interferometer implementing differential wavefront sensing for tilt measurement was developed over the last few years. With this setup, using an aluminium breadboard and compact optical mounts with a beam height of 2 cm, noise levels less than 5 pm Hz −1/2 in translation and less than 10 nrad Hz −1/2 in tilt measurement, both for frequencies above 10 −2 Hz, have been demonstrated. Here, a new, compact and ruggedized interferometer setup utilizing a baseplate made of Zerodur, a thermally and mechanically highly stable glass ceramic with a coefficient of thermal expansion (CTE) of 2 × 10 −8 K −1 , is presented. The optical components are fixed to the baseplate using a specifically developed, easy-to-handle, assembly-integration technology based on a space-qualified two-component epoxy. While developed as a prototype for future applications aboard satellite space missions (such as Laser Interferometer Space Antenna), the interferometer is used in laboratory experiments for dilatometry and surface metrology. A first dilatometer setup with a demonstrated accuracy of 10 −7 K −1 in CTE measurement was realized. As it was seen that the accuracy is limited by the dimensional stability of the sample tube support, a new setup was developed utilizing Zerodur as structural material for the sample tube support. In another activity, the interferometer is used for characterization of high-quality mirror surfaces at the picometre level and for high-accuracy two-dimensional surface characterization in a prototype for industrial applications. In this paper, the corresponding designs, their realizations and first measurements of both applications in dilatometry and surface metrology are presented

In-line CD metrology with combined use of scatterometry and CD-SEM

Science.gov (United States)

Asano, Masafumi; Ikeda, Takahiro; Koike, Toru; Abe, Hideaki

2006-03-01

Measurement characteristics in scatterometry and CD-SEM for lot acceptance sampling of inline critical dimension (CD) metrology were investigated by using a statistical approach with Monte Carlo simulation. By operation characteristics curve analysis, producer's risk and consumer's risk arising from sampling were clarified. Single use of scatterometry involves a higher risk, such risk being particularly acute in the case of large intra-chip CD variation because it is unable to sufficiently monitor intra-chip CD variation including local CD error. Substituting scatterometry for conventional SEM metrology is accompanied with risks, resulting in the increase of unnecessary cost. The combined use of scatterometry and SEM metrology in which the sampling plan for SEM is controlled by scatterometry is a promising metrology from the viewpoint of the suppression of risks and cost. This is due to the effect that CD errors existing in the distribution tails are efficiently caught.

Generation of tunable, high repetition rate frequency combs with equalized spectra using carrier injection based silicon modulators

Science.gov (United States)

Nagarjun, K. P.; Selvaraja, Shankar Kumar; Supradeepa, V. R.

2016-03-01

High repetition-rate frequency combs with tunable repetition rate and carrier frequency are extensively used in areas like Optical communications, Microwave Photonics and Metrology. A common technique for their generation is strong phase modulation of a CW-laser. This is commonly implemented using Lithium-Niobate based modulators. With phase modulation alone, the combs have poor spectral flatness and significant number of missing lines. To overcome this, a complex cascade of multiple intensity and phase modulators are used. A comb generator on Silicon based on these principles is desirable to enable on-chip integration with other functionalities while reducing power consumption and footprint. In this work, we analyse frequency comb generation in carrier injection based Silicon modulators. We observe an interesting effect in these comb generators. Enhanced absorption accompanying carrier injection, an undesirable effect in data modulators, shapes the amplitude here to enable high quality combs from a single modulator. Thus, along with reduced power consumption to generate a specific number of lines, the complexity has also been significantly reduced. We use a drift-diffusion solver and mode solver (Silvaco TCAD) along with Soref-Bennett relations to calculate the variations in refractive indices and absorption of an optimized Silicon PIN - waveguide modulator driven by an unbiased high frequency (10 Ghz) voltage signal. Our simulations demonstrate that with a device length of 1 cm, a driving voltage of 2V and minor shaping with a passive ring-resonator filter, we obtain 37 lines with a flatness better than 5-dB across the band and power consumption an order of magnitude smaller than Lithium-Niobate modulators.

The Act of 17 March 2000 on metrology and on changes and amendments of some acts

International Nuclear Information System (INIS)

2000-01-01

This act metrology for organization of unity and correctness of mensuration adapts (a) the law measurement units, (b) the requests on committed gauges and their metrological control, (c) the conditions of official mensuration, (d) the requests on consumptive packages articles; (e) the conditions of authorization and registration, (f) operation of organs of the state administration for metrology, (g) the metrological authority (h) putting of fines. This act shall into effect on 1 July 2000

Optical metrology techniques for dimensional stability measurements

NARCIS (Netherlands)

Ellis, Jonathan David

2010-01-01

This thesis work is optical metrology techniques to determine material stability. In addition to displacement interferometry, topics such as periodic nonlinearity, Fabry-Perot interferometry, refractometry, and laser stabilization are covered.

Parametric boundary reconstruction algorithm for industrial CT metrology application.

Science.gov (United States)

Yin, Zhye; Khare, Kedar; De Man, Bruno

2009-01-01

High-energy X-ray computed tomography (CT) systems have been recently used to produce high-resolution images in various nondestructive testing and evaluation (NDT/NDE) applications. The accuracy of the dimensional information extracted from CT images is rapidly approaching the accuracy achieved with a coordinate measuring machine (CMM), the conventional approach to acquire the metrology information directly. On the other hand, CT systems generate the sinogram which is transformed mathematically to the pixel-based images. The dimensional information of the scanned object is extracted later by performing edge detection on reconstructed CT images. The dimensional accuracy of this approach is limited by the grid size of the pixel-based representation of CT images since the edge detection is performed on the pixel grid. Moreover, reconstructed CT images usually display various artifacts due to the underlying physical process and resulting object boundaries from the edge detection fail to represent the true boundaries of the scanned object. In this paper, a novel algorithm to reconstruct the boundaries of an object with uniform material composition and uniform density is presented. There are three major benefits in the proposed approach. First, since the boundary parameters are reconstructed instead of image pixels, the complexity of the reconstruction algorithm is significantly reduced. The iterative approach, which can be computationally intensive, will be practical with the parametric boundary reconstruction. Second, the object of interest in metrology can be represented more directly and accurately by the boundary parameters instead of the image pixels. By eliminating the extra edge detection step, the overall dimensional accuracy and process time can be improved. Third, since the parametric reconstruction approach shares the boundary representation with other conventional metrology modalities such as CMM, boundary information from other modalities can be directly

Tests of operating conditions for metrological application of HTS Josephson arrays

International Nuclear Information System (INIS)

Sosso, A; Lacquaniti, V; Andreone, D; Cerri, R; Klushin, A M

2006-01-01

We report on an experimental study of metrological properties of High Temperature Superconductor arrays, made of shunted bicrystal YBCO Josephson junctions, to assess their accuracy. A detailed analysis of measurement errors is presented, mainly based on a direct comparison of an HTS array against a low temperature array. Owing to the high sensitivity of the comparison, we were able to measure the changes in the HTS array voltage on a step at nanovolt level. A precise estimate of the dependence of the HTS array step width on operating conditions was obtained. Differences were observed with respect to the results provided by the usual, low sensitivity, techniques, confirming that the method we adopted is necessary in the study of HTS arrays for metrology. The high sensitivity analysis was applied in the derivation of the temperature dependence of the critical current as well, providing some insights on the behaviour of the HTS array

SIP-Based Single Neuron Stochastic Predictive Control for Non-Gaussian Networked Control Systems with Uncertain Metrology Delays

Directory of Open Access Journals (Sweden)

Xinying Xu

2018-06-01

Full Text Available In this paper, a novel data-driven single neuron predictive control strategy is proposed for non-Gaussian networked control systems with metrology delays in the information theory framework. Firstly, survival information potential (SIP, instead of minimum entropy, is used to formulate the performance index to characterize the randomness of the considered systems, which is calculated by oversampling method. Then the minimum values can be computed by optimizing the SIP-based performance index. Finally, the proposed strategy, minimum entropy method and mean square error (MSE are applied to a networked motor control system, and results demonstrated the effectiveness of the proposed strategy.

Activities of IPEN Nuclear Metrology Laboratory

International Nuclear Information System (INIS)

Dias, M.S.; Koskinas, M.F.; Pocobi, E.; Silva, C.A.M.; Machado, R.R.

1987-01-01

The activities of IPEN Nuclear Metrology Laboratory, which the principal objective is radionuclides activities determination for supplying sources and standard radioactive solutions in activity are presented. The systems installed, the activity bands and some of standards radionuclides are shown. (C.G.C.) [pt

Low-cost precise measurement of oscillator frequency instability based on GNSS carrier observation

Science.gov (United States)

Kou, Yanhong; Jiao, Yue; Xu, Dongyang; Zhang, Meng; Liu, Ya; Li, Xiaohui

2013-03-01

Global navigation satellite systems (GNSS) receivers can be used in time and frequency metrology by exploiting stable GNSS time scales. This paper proposes a low-cost method for precise measurement of oscillator frequency instability using a single-frequency software GNSS receiver. The only required hardware is a common radio frequency (RF) data collection device driven by the oscillator under test (OUT). The receiver solves the oscillator frequency error in high time resolution using the carrier Doppler observation and the broadcast ephemeris from one of the available satellites employing the onboard reference atomic frequency standard that is more stable than the OUT. Considering the non-stable and non-Gaussian properties of the frequency error measurement, an unbiased finite impulse response (FIR) filter is employed to obtain robust estimation and filter out measurement noise. The effects of different filter orders and convolution lengths are further discussed. The frequency error of an oven controlled oscillator (OCXO) is measured using live Beidou-2/Compass signals. The results are compared with the synchronous measurement using a specialized phase comparator with the standard coordinated universal time (UTC) signal from the master clock H226 in the national time service center (NTSC) of China as its reference. The Allan deviation (ADEV) estimates using the two methods have a 99.9% correlation coefficient and a 0.6% mean relative difference over 1-1000 s intervals. The experiment demonstrates the effectiveness and high precision of the software receiver method.

Low frequency radioastronomy

International Nuclear Information System (INIS)

Zarka, Philippe; Cecconi, Baptiste; Tagger, Michel; Torchinsky, Steve; Picard, Philippe; Pezzani, Jacques; Cognard, Ismael; Boone, Frederic; Woan, Graham; Weber, Rodolphe; Gousset, Thierry; Lautridou, Pascal; Dallier, Richard

2011-07-01

Low frequency radioastronomy deals with the direct detection (below 100 MHz) and heterodyne detection (up to few GHz) of electromagnetic waves (phase and amplitude) followed by a time or spectral analysis. The 30. Goutelas school covered several aspects of radioastronomy involving various aspects of physics: non-thermal phenomena in plasmas and physics of magnetized plasmas, atomic and molecular physics, and particle physics. These proceedings comprise 17 lectures dealing with: 1 - Low-Frequency Radioastronomy Basics (P. Zarka); 2 - Radioastronomy Historical Highlights (S. A. Torchinsky); 3 - Antennas (P. Picard, J. Pezzani); 4 - Receptors (P. Picard, J. Pezzani); 5 - Pulsars chronometry: metrology in radioastronomy (I. Cognard); 6 - Interferometry as imaging technique (F. Boone); 7 - Radio propagation and scintillation (G. Woan); 8 - Square Kilometer Array (S. A. Torchinsky); 9 - Techniques against radio-electrical interferences in low-frequency radioastronomy (R. Weber); 10 - Introduction to poly-phase filtering (R. Weber); 11 - Three decades of Jupiter's radio-emission studies: from the Nancay deca-meter network to LOFAR (P. Zarka); 12 - Atmospheric showers and their radio counterpart (T. Gousset); 13 - From cosmic rays radio-detection to pulse radioastronomy (P. Lautridou, R. Dallier); 14 - The CODALEMA project (R. Dallier, P. Lautridou); 15 - Space-based radio measurements: Gonio-polarimetry (B. Cecconi); 16 - Radio astronomy from space (G. Woan); 17 - LOFAR: the Low Frequency Array and the French FLOW consortium (M. Tagger, P. Zarka)

Towards a Uniform Metrological Assessment of Grating-Based Optical Fiber Sensors: From Refractometers to Biosensors.

Science.gov (United States)

Chiavaioli, Francesco; Gouveia, Carlos A J; Jorge, Pedro A S; Baldini, Francesco

2017-06-21

A metrological assessment of grating-based optical fiber sensors is proposed with the aim of providing an objective evaluation of the performance of this sensor category. Attention was focused on the most common parameters, used to describe the performance of both optical refractometers and biosensors, which encompassed sensitivity, with a distinction between volume or bulk sensitivity and surface sensitivity, resolution, response time, limit of detection, specificity (or selectivity), reusability (or regenerability) and some other parameters of generic interest, such as measurement uncertainty, accuracy, precision, stability, drift, repeatability and reproducibility. Clearly, the concepts discussed here can also be applied to any resonance-based sensor, thus providing the basis for an easier and direct performance comparison of a great number of sensors published in the literature up to now. In addition, common mistakes present in the literature made for the evaluation of sensor performance are highlighted, and lastly a uniform performance assessment is discussed and provided. Finally, some design strategies will be proposed to develop a grating-based optical fiber sensing scheme with improved performance.

Manufacturing and metrology for IR conformal windows and domes

Science.gov (United States)

Ferralli, Ian; Blalock, Todd; Brunelle, Matt; Lynch, Timothy; Myer, Brian; Medicus, Kate

2017-05-01

Freeform and conformal optics have the potential to dramatically improve optical systems by enabling systems with fewer optical components, reduced aberrations, and improved aerodynamic performance. These optical components differ from standard components in their surface shape, typically a non-symmetric equation based definition, and material properties. Traditional grinding and polishing tools are unable to handle these freeform shapes. Additionally, standard metrology tools cannot measure these surfaces. Desired substrates are typically hard ceramics, including poly-crystalline alumina or aluminum oxynitride. Notwithstanding the challenges that the hardness provides to manufacturing, these crystalline materials can be highly susceptible to grain decoration creating unacceptable scatter in optical systems. In this presentation, we will show progress towards addressing the unique challenges of manufacturing conformal windows and domes. Particular attention is given to our robotic polishing platform. This platform is based on an industrial robot adapted to accept a wide range of tooling and parts. The robot's flexibility has provided us an opportunity to address the unique challenges of conformal windows. Slurries and polishing active layers can easily be changed to adapt to varying materials and address grain decoration. We have the flexibility to change tool size and shape to address the varying sizes and shapes of conformal optics. In addition, the robotic platform can be a base for a deflectometry-based metrology tool to measure surface form error. This system, whose precision is independent of the robot's positioning accuracy, will allow us to measure optics in-situ saving time and reducing part risk. In conclusion, we will show examples of the conformal windows manufactured using our developed processes.

Coherence enhanced quantum metrology in a nonequilibrium optical molecule

Science.gov (United States)

Wang, Zhihai; Wu, Wei; Cui, Guodong; Wang, Jin

2018-03-01

We explore the quantum metrology in an optical molecular system coupled to two environments with different temperatures, using a quantum master equation beyond secular approximation. We discover that the steady-state coherence originating from and sustained by the nonequilibrium condition can enhance quantum metrology. We also study the quantitative measures of the nonequilibrium condition in terms of the curl flux, heat current and entropy production at the steady state. They are found to grow with temperature difference. However, an apparent paradox arises considering the contrary behaviors of the steady-state coherence and the nonequilibrium measures in relation to the inter-cavity coupling strength. This paradox is resolved by decomposing the heat current into a population part and a coherence part. Only the latter, the coherence part of the heat current, is tightly connected to the steady-state coherence and behaves similarly with respect to the inter-cavity coupling strength. Interestingly, the coherence part of the heat current flows from the low-temperature reservoir to the high-temperature reservoir, opposite to the direction of the population heat current. Our work offers a viable way to enhance quantum metrology for open quantum systems through steady-state coherence sustained by the nonequilibrium condition, which can be controlled and manipulated to maximize its utility. The potential applications go beyond quantum metrology and extend to areas such as device designing, quantum computation and quantum technology in general.

Mycotoxin metrology: Gravimetric production of zearalenone calibration solution

Science.gov (United States)

Rego, E. C. P.; Simon, M. E.; Li, Xiuqin; Li, Xiaomin; Daireaux, A.; Choteau, T.; Westwood, S.; Josephs, R. D.; Wielgosz, R. I.; Cunha, V. S.

2018-03-01

Food safety is a major concern for countries developing metrology and quality assurance systems, including the contamination of food and feed by mycotoxins. To improve the mycotoxin analysis and ensure the metrological traceability, CRM of calibration solution should be used. The production of certified mycotoxin solutions is a major challenge due to the limited amount of standard for conducting a proper purity study and due to the cost of standards. The CBKT project was started at BIPM and Inmetro produced gravimetrically one batch of zearelenone in acetronitrile (14.708 ± 0.016 μg/g, k=2) and conducted homogeneity, stability and value assignment studies.

Development of Electromechanical Architectures for AC Voltage Metrology

Directory of Open Access Journals (Sweden)

Alexandre BOUNOUH

2010-12-01

Full Text Available This paper presents results of work undertaken for exploring MEMS capabilities to fabricate AC voltage references for electrical metrology and high precision instrumentation through the mechanical-electrical coupling in MEMS. From first MEMS test structures previously realized, a second set of devices with improved characteristics has been developed and fabricated with Silicon on Insulator (SOI Surface Micromachining process. These MEMS exhibit pull-in voltages of 5 V and 10 V to match with the best performance of the read-out electronics developed for driving the MEMS. Deep Level Transient Spectroscopy measurements carried out on the new design show resonance frequencies of about only some kHz, and the stability of the MEMS output voltage measured at 100 kHz has been found very promising for the best samples where the relative deviation from the mean value over almost 12 hours showed a standard deviation of about 6.3 ppm.

Alignment of KB mirrors with at-wavelength metrology tool simulated using SRW

Science.gov (United States)

Idir, Mourad; Rakitin, Maksim; Gao, Bo; Xue, Junpeng; Huang, Lei; Chubar, Oleg

2017-08-01

Synchrotron Radiation Workshop (SRW) is a powerful synchrotron radiation simulation tool and has been widely used at synchrotron facilities all over the world. During the last decade, many types of X-ray wavefront sensors have been developed and used. In this work, we present our recent effort on the development of at-wavelength metrology simulation based on SRW mainly focused on the Hartmann Wavefront Sensor (HWS). Various conditions have been studied to verify that the simulated HWS is performing as expected in terms of accuracy. This at-wavelength metrology simulation tool is then used to align KB mirrors by minimizing the wavefront aberrations. We will present our optimization process to perform an `in situ' alignment using conditions as close as possible to the real experiments (KB mirrors with different levels of figure errors or different misalignment geometry).

The need for LWR metrology standardization: the imec roughness protocol

Science.gov (United States)

Lorusso, Gian Francesco; Sutani, Takumichi; Rutigliani, Vito; van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunsuke

2018-03-01

As semiconductor technology keeps moving forward, undeterred by the many challenges ahead, one specific deliverable is capturing the attention of many experts in the field: Line Width Roughness (LWR) specifications are expected to be less than 2nm in the near term, and to drop below 1nm in just a few years. This is a daunting challenge and engineers throughout the industry are trying to meet these targets using every means at their disposal. However, although current efforts are surely admirable, we believe they are not enough. The fact is that a specification has a meaning only if there is an agreed methodology to verify if the criterion is met or not. Such a standardization is critical in any field of science and technology and the question that we need to ask ourselves today is whether we have a standardized LWR metrology or not. In other words, if a single reference sample were provided, would everyone measuring it get reasonably comparable results? We came to realize that this is not the case and that the observed spread in the results throughout the industry is quite large. In our opinion, this makes the comparison of LWR data among institutions, or to a specification, very difficult. In this paper, we report the spread of measured LWR data across the semiconductor industry. We investigate the impact of image acquisition, measurement algorithm, and frequency analysis parameters on LWR metrology. We review critically some of the International Technology Roadmap for Semiconductors (ITRS) metrology guidelines (such as measurement box length larger than 2μm and the need to correct for SEM noise). We compare the SEM roughness results to AFM measurements. Finally, we propose a standardized LWR measurement protocol - the imec Roughness Protocol (iRP) - intended to ensure that every time LWR measurements are compared (from various sources or to specifications), the comparison is sensible and sound. We deeply believe that the industry is at a point where it is

Iodine frequency references for space

International Nuclear Information System (INIS)

Schuldt, Thilo; Braxmaier, Claus; Döringshoff, Klaus; Peters, Achim; Oswald, Markus; Johann, Ulrich

2017-01-01

Optical frequency references are a key element for the realization of future space missions. They are needed for missions related to tests of fundamental physics, gravitational wave detection, Earth observation and navigation and ranging. In missions such as GRACE follow-on or LISA the optical frequency reference is used as light source for high-sensitivity inter-satellite distance metrology. While cavity-based systems are current baseline e.g. for LISA, frequency stabilization on a hyperfine transition in molecular iodine near 532 nm is a promising alternative. Due to its absolute frequency, iodine standards crucially simplify the initial spacecraft acquisition procedures. Current setups fulfill the GRACE-FO and LISA frequency stability requirements and are realized near Engineering Model level. We present the current status of our developments on Elegant Breadboard (EBB) and Engineering Model (EM) level taking into account specific design criteria for space compatibility such as compactness (size iodine spectroscopy EM: 38 × 18 × 10 cm 3 ) and robustness. Both setups achieved similar frequency stabilities of ∼ 1 · 10 −14 at an integration time of 1 s and below 5 · 10 −15 at integration times between 10 s and 1000 s. Furthermore, we present an even more compact design currently developed for a sounding rocket mission with launch in 2017. (paper)

Determination of the elementary charge and the quantum metrological triangle experiment

Energy Technology Data Exchange (ETDEWEB)

Feltin, N.; Piquemal, F. [Laboratoire National de Metrologie et d' Essais (LNE), 78 - Trappes (France)

2009-06-15

The elementary charge e is of fundamental importance in physics. The determination of its value, which is closely linked to progress of the measurement techniques, started in the beginning of the twentieth century and is still on-going. Today, in the frame of the CODATA adjustment, the evaluation of the fundamental constant, e, is derived from a complex calculation and is no more related to a single experiment. But the development of single electron tunneling (SET) devices, started in the early nineties, has opened the path towards modern metrological systems as quantum current sources. Thus a new direct determination of e is possible by implementing an electron pump and the set-up of the quantum metrological triangle (QMT) in combination with the experiments linking mechanical and electrical units. Furthermore, we show how the QMT experiment can contribute to the establishment of a new system of units based on fundamental constants of physics. (authors)

Regional metrology organisations and the JCRB

International Nuclear Information System (INIS)

Hetherington, Paul

2004-01-01

In 1999, National Metrology Institutes (NMIs) from some 39 countries signed the International Committee of Weights and Measures (CIPM) Mutual Recognition Arrangement (MRA) in Paris. The MRA, drawn up by the CIPM, under the authority given to it in the Metre Convention, was in response to requirements of Governments and Regulators to provide a sound technical foundation for trade agreements. Core objectives of the MRA are to allow for the establishment of the degree of equivalence of national measurement standards and to provide for mutual recognition of calibration certificates issued by NMIs. This presentation will detail the evolution of the MRA. Globally, NMIs are affiliated to Regional Metrology Organisations (RMOs). The key role of the RMOs in the MRA process will be discussed along with the structure and objectives of the various RMOs worldwide. The Joint Committee of the RMOs and the BIPM (JCRB) plays a central part in the effective operation of the MRA. Its tasks, membership and output will also be described

PREFACE: Fundamental Constants in Physics and Metrology

Science.gov (United States)

Klose, Volkmar; Kramer, Bernhard

1986-01-01

This volume contains the papers presented at the 70th PTB Seminar which, the second on the subject "Fundamental Constants in Physics and Metrology", was held at the Physikalisch-Technische Bundesanstalt in Braunschweig from October 21 to 22, 1985. About 100 participants from the universities and various research institutes of the Federal Republic of Germany participated in the meeting. Besides a number of review lectures on various broader subjects there was a poster session which contained a variety of topical contributed papers ranging from the theory of the quantum Hall effect to reports on the status of the metrological experiments at the PTB. In addition, the participants were also offered the possibility to visit the PTB laboratories during the course of the seminar. During the preparation of the meeting we noticed that even most of the general subjects which were going to be discussed in the lectures are of great importance in connection with metrological experiments and should be made accessible to the scientific community. This eventually resulted in the idea of the publication of the papers in a regular journal. We are grateful to the editor of Metrologia for providing this opportunity. We have included quite a number of papers from basic physical research. For example, certain aspects of high-energy physics and quantum optics, as well as the many-faceted role of Sommerfeld's fine-structure constant, are covered. We think that questions such as "What are the intrinsic fundamental parameters of nature?" or "What are we doing when we perform an experiment?" can shed new light on the art of metrology, and do, potentially, lead to new ideas. This appears to be especially necessary when we notice the increasing importance of the role of the fundamental constants and macroscopic quantum effects for the definition and the realization of the physical units. In some cases we have reached a point where the limitations of our knowledge of a fundamental constant and

The future of 2D metrology for display manufacturing

Science.gov (United States)

Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

2016-10-01

The race to 800 PPI and higher in mobile devices and the transition to OLED displays are driving a dramatic development of mask quality: resolution, CDU, registration, and complexity. 2D metrology for large area masks is necessary and must follow the roadmap. Driving forces in the market place point to continued development of even more dense displays. State-of-the-art metrology has proven itself capable of overlay below 40 nm and registration below 65 nm for G6 masks. Future developments include incoming and recurrent measurements of pellicalized masks at the panel maker's factory site. Standardization of coordinate systems across supplier networks is feasible. This will enable better yield and production economy for both mask and panel maker. Better distortion correction methods will give better registration on the panels and relax the flatness requirements of the mask blanks. If panels are measured together with masks and the results are used to characterize the aligners, further quality and yield improvements are possible. Possible future developments include in-cell metrology and integration with other instruments in the same platform.

Metrology requirements for the serial production of ELT primary mirror segments

Science.gov (United States)

Rees, Paul C. T.; Gray, Caroline

2015-08-01

The manufacture of the next generation of large astronomical telescopes, the extremely large telescopes (ELT), requires the rapid manufacture of greater than 500 1.44m hexagonal segments for the primary mirror of each telescope. Both leading projects, the Thirty Meter Telescope (TMT) and the European Extremely Large Telescope (E-ELT), have set highly demanding technical requirements for each fabricated segment. These technical requirements, when combined with the anticipated construction schedule for each telescope, suggest that more than one optical fabricator will be involved in the delivery of the primary mirror segments in order to meet the project schedule. For one supplier, the technical specification is challenging and requires highly consistent control of metrology in close coordination with the polishing technologies used in order to optimize production rates. For production using multiple suppliers, however the supply chain is structured, consistent control of metrology along the supply chain will be required. This requires a broader pattern of independent verification than is the case of a single supplier. This paper outlines the metrology requirements for a single supplier throughout all stages of the fabrication process. We identify and outline those areas where metrology accuracy and duration have a significant impact on production efficiency. We use the challenging ESO E-ELT technical specification as an example of our treatment, including actual process data. We further develop this model for the case of a supply chain consisting of multiple suppliers. Here, we emphasize the need to control metrology throughout the supply chain in order to optimize net production efficiency.

Metrological traceability of holmium oxide solution

Science.gov (United States)

Gonçalves, D. E. F.; Gomes, J. F. S.; Alvarenga, A. P. D.; Borges, P. P.; Araujo, T. O.

2018-03-01

Holmium oxide solution was prepared as a candidate of certified reference material for spectrophotometer wavelength scale calibration. Here is presented the necessary steps for evaluation of the uncertainty and the establishment of metrological traceability for the production of this material. Preliminary results from the first produced batch are shown.

Issues of Teaching Metrology in Higher Education Institutions of Civil Engineering in Russia

Science.gov (United States)

Pukharenko, Yurii Vladimirovich; Norin, Veniamin Aleksandrovich

2017-01-01

The work analyses the training process condition in teaching the discipline "Metrology, Standardization, Certification and Quality Control." It proves that the current educational standard regarding the instruction of the discipline "Metrology, Standardization, Certification and Quality Control" does not meet the needs of the…

Metrology for ITER Assembly

International Nuclear Information System (INIS)

Bogusch, E.

2006-01-01

The overall dimensions of the ITER Tokamak and the particular assembly sequence preclude the use of conventional optical metrology, mechanical jigs and traditional dimensional control equipment, as used for the assembly of smaller, previous generation, fusion devices. This paper describes the state of the art of the capabilities of available metrology systems, with reference to the previous experience in Fusion engineering and in other industries. Two complementary procedures of transferring datum from the primary datum network on the bioshield to the secondary datum s inside the VV with the desired accuracy of about 0.1 mm is described, one method using the access directly through the ports and the other using transfer techniques, developed during the co-operation with ITER/EFDA. Another important task described is the development of a method for the rapid and easy measurement of the gaps between sectors, required for the production of the customised splice plates between them. The scope of the paper includes the evaluation of the composition and cost of the systems and team of technical staff required to meet the requirements of the assembly procedure. The results from a practical, full-scale demonstration of the methodologies used, using the proposed equipment, is described. This work has demonstrated the feasibility of achieving the necessary accuracies for the successful building of ITER. (author)

Metrology of radiation protection. Pt. 1. Physical requirements and terminology

Energy Technology Data Exchange (ETDEWEB)

Wagner, S R

1979-10-01

Starting from a general consideration of the needs for radiation protection the physical requirements of a relevant metrology are developed. The expedient physical quantities are introduced and problems in the realization and dissemination of their units discussed. It is shown that owing to these difficulties, derived or operational quantities have to be developed for the construction and calibration of practical measuring instruments. Finally the relations between the metrology of radiation protection and of medical radiology are pointed out and commented. (orig.).

Forum metrology 2009: control of optics, targets and optical analyzers

International Nuclear Information System (INIS)

Desenne, D.; Andre, R.

2010-01-01

The 1. 'Forum Metrologie' of the CEA/DAM has been held in the 'Institut Laser et Plasma' on the December 9, 2009, close to the 'Centre d'etudes Scientifiques et Techniques d'Aquitaine'. It has been set up by the 'Departement Lasers de Puissance'. The chosen thematic was the metrology around laser experiments, with a special focus on the metrology of the dedicated optics, targets and optical analysers. The talks have shown the progress and difficulties in each of these fields. (authors)

Metrological Array of Cyber-Physical Systems. Part 11. Remote Error Correction of Measuring Channel

Directory of Open Access Journals (Sweden)

Yuriy YATSUK

2015-09-01

Full Text Available The multi-channel measuring instruments with both the classical structure and the isolated one is identified their errors major factors basing on general it metrological properties analysis. Limiting possibilities of the remote automatic method for additive and multiplicative errors correction of measuring instruments with help of code-control measures are studied. For on-site calibration of multi- channel measuring instruments, the portable voltage calibrators structures are suggested and their metrological properties while automatic errors adjusting are analysed. It was experimentally envisaged that unadjusted error value does not exceed ± 1 mV that satisfies most industrial applications. This has confirmed the main approval concerning the possibilities of remote errors self-adjustment as well multi- channel measuring instruments as calibration tools for proper verification.

State preparation for quantum information science and metrology

International Nuclear Information System (INIS)

Samblowski, Aiko

2012-01-01

The precise preparation of non-classical states of light is a basic requirement for performing quantum information tasks and quantum metrology. Depending on the assignment, the range of required states varies from preparing and modifying squeezed states to generating bipartite entanglement and establishing multimode entanglement networks. Every state needs special preparation techniques and hence it is important to develop the experimental expertise to generate all states with the desired degree of accuracy. In this thesis, the experimental preparation of different kinds of non-classical states of light is demonstrated. Starting with a multimode entangled state, the preparation of an unconditionally generated bound entangled state of light of unprecedented accuracy is shown. Its existence is of fundamental interest, since it certifies an intrinsic irreversibility of entanglement and suggests a connection with thermodynamics. The state is created in a network of linear optics, utilizing optical parametric amplifiers, operated below threshold, beam splitters and phase gates. The experimental platform developed here afforded the precise and stable control of all experimental parameters. Focusing on the aspect of quantum information networks, the generation of suitable bipartite entangled states of light is desirable. The optical connection between atomic transitions and light that can be transmitted via telecommunications fibers opens the possibility to employ quantum memories within fiber networks. For this purpose, a non-degenerate optical parametric oscillator is operated above threshold and the generation of bright bipartite entanglement between its twin beams at the wavelengths of 810 nm and 1550 nm is demonstrated. In the field of metrology, quantum states are used to enhance the measurement precision of interferometric gravitational wave (GW) detectors. Recently, the sensitivity of a GW detector operated at a wavelength of 1064 nm was increased using squeezed

State preparation for quantum information science and metrology

Energy Technology Data Exchange (ETDEWEB)

Samblowski, Aiko

2012-06-08

The precise preparation of non-classical states of light is a basic requirement for performing quantum information tasks and quantum metrology. Depending on the assignment, the range of required states varies from preparing and modifying squeezed states to generating bipartite entanglement and establishing multimode entanglement networks. Every state needs special preparation techniques and hence it is important to develop the experimental expertise to generate all states with the desired degree of accuracy. In this thesis, the experimental preparation of different kinds of non-classical states of light is demonstrated. Starting with a multimode entangled state, the preparation of an unconditionally generated bound entangled state of light of unprecedented accuracy is shown. Its existence is of fundamental interest, since it certifies an intrinsic irreversibility of entanglement and suggests a connection with thermodynamics. The state is created in a network of linear optics, utilizing optical parametric amplifiers, operated below threshold, beam splitters and phase gates. The experimental platform developed here afforded the precise and stable control of all experimental parameters. Focusing on the aspect of quantum information networks, the generation of suitable bipartite entangled states of light is desirable. The optical connection between atomic transitions and light that can be transmitted via telecommunications fibers opens the possibility to employ quantum memories within fiber networks. For this purpose, a non-degenerate optical parametric oscillator is operated above threshold and the generation of bright bipartite entanglement between its twin beams at the wavelengths of 810 nm and 1550 nm is demonstrated. In the field of metrology, quantum states are used to enhance the measurement precision of interferometric gravitational wave (GW) detectors. Recently, the sensitivity of a GW detector operated at a wavelength of 1064 nm was increased using squeezed

Sub-atomic dimensional metrology: developments in the control of x-ray interferometers

Science.gov (United States)

Yacoot, Andrew; Kuetgens, Ulrich

2012-07-01

Within the European Metrology Research Programme funded project NANOTRACE, the nonlinearity of the next generation of optical interferometers has been measured using x-ray interferometry. The x-ray interferometer can be regarded as a ruler or translation stage whose graduations or displacement steps are based on the lattice spacing of the crystallographic planes from which the x-rays are diffracted: in this case the graduations are every 192 pm corresponding to the spacing between the (2 2 0) planes in silicon. Precise displacement of the x-ray interferometer's monolithic translation stage in steps corresponding to discrete numbers of x-ray fringes requires servo positioning capability at the picometre level. To achieve this very fine control, a digital control system has been developed which has opened up the potential for advances in metrology using x-ray interferometry that include quadrature counting of x-ray fringes.

Sub-atomic dimensional metrology: developments in the control of x-ray interferometers

International Nuclear Information System (INIS)

Yacoot, Andrew; Kuetgens, Ulrich

2012-01-01

Within the European Metrology Research Programme funded project NANOTRACE, the nonlinearity of the next generation of optical interferometers has been measured using x-ray interferometry. The x-ray interferometer can be regarded as a ruler or translation stage whose graduations or displacement steps are based on the lattice spacing of the crystallographic planes from which the x-rays are diffracted: in this case the graduations are every 192 pm corresponding to the spacing between the (2 2 0) planes in silicon. Precise displacement of the x-ray interferometer's monolithic translation stage in steps corresponding to discrete numbers of x-ray fringes requires servo positioning capability at the picometre level. To achieve this very fine control, a digital control system has been developed which has opened up the potential for advances in metrology using x-ray interferometry that include quadrature counting of x-ray fringes. (paper)

Metrological inspection of ionization chamber radioactivity meters used in nuclear medicine

International Nuclear Information System (INIS)

Szoerenyi, A.; Vagvoelgyi, J.

1983-01-01

According to the Hungarian legislation on legal metrology, any measurement involving legal effects (e.g. measurements in nuclear medicine) can only be performed by calibrated measuring instruments. The paper outlines the method and results of calibration for 125 I and 131 I radionuclide standard references used in Hungarian nuclear medical practice. The experiences proved that the radionuclide standards, similarly to radiation dosemeters, should be submitted for metrological inspection. (author)

Entanglement and Metrology with Singlet-Triplet Qubits

Science.gov (United States)

Shulman, Michael Dean

Electron spins confined in semiconductor quantum dots are emerging as a promising system to study quantum information science and to perform sensitive metrology. Their weak interaction with the environment leads to long coherence times and robust storage for quantum information, and the intrinsic tunability of semiconductors allows for controllable operations, initialization, and readout of their quantum state. These spin qubits are also promising candidates for the building block for a scalable quantum information processor due to their prospects for scalability and miniaturization. However, several obstacles limit the performance of quantum information experiments in these systems. For example, the weak coupling to the environment makes inter-qubit operations challenging, and a fluctuating nuclear magnetic field limits the performance of single-qubit operations. The focus of this thesis will be several experiments which address some of the outstanding problems in semiconductor spin qubits, in particular, singlet-triplet (S-T0) qubits. We use these qubits to probe both the electric field and magnetic field noise that limit the performance of these qubits. The magnetic noise bath is probed with high bandwidth and precision using novel techniques borrowed from the field of Hamiltonian learning, which are effective due to the rapid control and readout available in S-T 0 qubits. These findings allow us to effectively undo the undesired effects of the fluctuating nuclear magnetic field by tracking them in real-time, and we demonstrate a 30-fold improvement in the coherence time T2*. We probe the voltage noise environment of the qubit using coherent qubit oscillations, which is partially enabled by control of the nuclear magnetic field. We find that the voltage noise bath is frequency-dependent, even at frequencies as high as 1MHz, and it shows surprising and, as of yet, unexplained temperature dependence. We leverage this knowledge of the voltage noise environment, the

Radiation effects on optical components of a laser radar sensor designed for remote metrology in ITER

International Nuclear Information System (INIS)

Menon, M.M.; Grann, E.B.; Slotwinski, A.

1997-09-01

A frequency modulated laser radar is being developed for in-vessel metrology and viewing of plasma-facing surfaces. Some optical components of this sensor must withstand intense gamma radiation (3 x 10 6 rad/h) during operation. The authors have tested the effect of radiation on a silica core polarization maintaining optical fiber and on TeO 2 crystals at doses up to ∼ 10 9 rad. Additional tests are planned for evaluating the performance of a complete acousto-optic (AO) scanning device. The progress made in these tests is also described

Material synthesis and evaluation of metrological characteristics of potassium fluozirconate certified reference material

Directory of Open Access Journals (Sweden)

D. G. Lisienko

2016-01-01

Full Text Available The relevance of the study. For metrological support of control methods for composition ofpotassium fluozirconate, used in the production of metallic zirconium, applied in various technical fields, including nuclear power, electronics, chemical engineering. The purpose: development of synthesis technology, and determination of metrological characteristics of certified reference material for composition ofpotassium fluozirconate (set, intended for metrological support of measuring element mass fraction: hafnium (Hf, silicon (Si, iron (Fe, aluminium (Al, chromium (Cr, tin (Sn, titanium (Ti in potassium fluozirconate. Research methods: X-ray diffraction, differential scanning colorimetry, thermogravimetric analysis, atomic-emission spectral analysis with arc excitation, mass spectral analysis, X-ray fluorescence analysis. Results. As a result of research a set of certified reference materials for composition of potassium fluozirconate is developed and produced. The CRM type is approved by Federal Agency on Technical Regulating and Metrology and registered in State Register of Approved Reference Material Types under number GSO 10593-2015.

Dispersion compensated mid-infrared quantum cascade laser frequency comb with high power output

Directory of Open Access Journals (Sweden)

Q. Y. Lu

2017-04-01

Full Text Available Chromatic dispersion control plays an underlying role in optoelectronics and spectroscopy owing to its enhancement to nonlinear interactions by reducing the phase mismatching. This is particularly important to optical frequency combs based on quantum cascade lasers which require negligible dispersions for efficient mode locking of the dispersed modes into equally spaced comb modes. Here, we demonstrated a dispersion compensated mid-IR quantum cascade laser frequency comb with high power output at room temperature. A low-loss dispersive mirror has been engineered to compensate the device’s dispersion residue for frequency comb generation. Narrow intermode beating linewidths of 40 Hz in the comb-working currents were identified with a high power output of 460 mW and a broad spectral coverage of 80 cm-1. This dispersion compensation technique will enable fast spectroscopy and high-resolution metrology based on QCL combs with controlled dispersion and suppressed noise.

Metrology Sampling Strategies for Process Monitoring Applications

KAUST Repository

Vincent, Tyrone L.; Stirton, James Broc; Poolla, Kameshwar

2011-01-01

, economic pressures prompt a reduction in metrology, for both capital and cycle-time reasons. This paper explores the use of modeling and minimum-variance prediction as a method to select the sites for measurement on each wafer. The models are developed

Dynamic Length Metrology (DLM) for measurements with sub-micrometre uncertainty in a production environment

DEFF Research Database (Denmark)

De Chiffre, Leonardo; Hansen, Hans Nørgaard; Hattel, Jesper Henri

2016-01-01

Conventional length metrology for traceable accurate measurements requires costly temperature controlled facilities, long waiting time for part acclimatisation, and separate part material characterisation. This work describes a method called Dynamic Length Metrology (DLM) developed to achieve sub...

Optimization of measurement methods for a multi-frequency electromagnetic field from mobile phone base station using broadband EMF meter

Directory of Open Access Journals (Sweden)

Paweł Bieńkowski

2015-10-01

Full Text Available Background: This paper presents the characteristics of the mobile phone base station (BS as an electromagnetic field (EMF source. The most common system configurations with their construction are described. The parameters of radiated EMF in the context of the access to methods and other parameters of the radio transmission are discussed. Attention was also paid to antennas that are used in this technology. Material and Methods: The influence of individual components of a multi-frequency EMF, most commonly found in the BS surroundings, on the resultant EMF strength value indicated by popular broadband EMF meters was analyzed. The examples of metrological characteristics of the most common EMF probes and 2 measurement scenarios of the multisystem base station, with and without microwave relays, are shown. Results: The presented method for measuring the multi-frequency EMF using 2 broadband probes allows for the significant minimization of measurement uncertainty. Equations and formulas that can be used to calculate the actual EMF intensity from multi-frequency sources are shown. They have been verified in the laboratory conditions on a specific standard setup as well as in real conditions in a survey of the existing base station with microwave relays. Conclusions: Presented measurement methodology of multi-frequency EMF from BS with microwave relays, validated both in laboratory and real conditions. It has been proven that the described measurement methodology is the optimal approach to the evaluation of EMF exposure in BS surrounding. Alternative approaches with much greater uncertainty (precaution method or more complex measuring procedure (sources exclusion method are also presented. Med Pr 2015;66(5:701–712

[Optimization of measurement methods for a multi-frequency electromagnetic field from mobile phone base station using broadband EMF meter].

Science.gov (United States)

Bieńkowski, Paweł; Cała, Paweł; Zubrzak, Bartłomiej

2015-01-01

This paper presents the characteristics of the mobile phone base station (BS) as an electromagnetic field (EMF) source. The most common system configurations with their construction are described. The parameters of radiated EMF in the context of the access to methods and other parameters of the radio transmission are discussed. Attention was also paid to antennas that are used in this technology. The influence of individual components of a multi-frequency EMF, most commonly found in the BS surroundings, on the resultant EMF strength value indicated by popular broadband EMF meters was analyzed. The examples of metrological characteristics of the most common EMF probes and 2 measurement scenarios of the multisystem base station, with and without microwave relays, are shown. The presented method for measuring the multi-frequency EMF using 2 broadband probes allows for the significant minimization of measurement uncertainty. Equations and formulas that can be used to calculate the actual EMF intensity from multi-frequency sources are shown. They have been verified in the laboratory conditions on a specific standard setup as well as in real conditions in a survey of the existing base station with microwave relays. Presented measurement methodology of multi-frequency EMF from BS with microwave relays, validated both in laboratory and real conditions. It has been proven that the described measurement methodology is the optimal approach to the evaluation of EMF exposure in BS surrounding. Alternative approaches with much greater uncertainty (precaution method) or more complex measuring procedure (sources exclusion method) are also presented). This work is available in Open Access model and licensed under a CC BY-NC 3.0 PL license.

Implementation of machine learning for high-volume manufacturing metrology challenges (Conference Presentation)

Science.gov (United States)

Timoney, Padraig; Kagalwala, Taher; Reis, Edward; Lazkani, Houssam; Hurley, Jonathan; Liu, Haibo; Kang, Charles; Isbester, Paul; Yellai, Naren; Shifrin, Michael; Etzioni, Yoav

2018-03-01

across 3 products. In the case of product C, it is found that the predicted Rs correlation to the e-test value is significantly improved utilizing spectra acquired at the e-test structure. This paper will explore the considerations required to enable use of machine learning derived metrology output to enable improved process monitoring and control. Further results from the FEOL and BEOL sectors will be presented, together with further discussion on future proliferation of machine learning based metrology solutions in high volume manufacturing.

Component-Level Demonstration of a Microfabricated Atomic Frequency Reference

Science.gov (United States)

2005-08-01

Kitching, L. A. Liew, and J. Moreland, "A microfabricated atomic clock," Applied Physics Letters, vol. 85, pp. 1460-1462, 2004. [4] R. Lutwak , P...Symposium on Frequency Standards and Metrology, P. Gill, Ed. St. Andrews, Scotland: World Scientific, 2001, pp. 155-166. [31] R. Lutwak , D. Emmons...Frequency and Time Forum. Tampa, FL, 2003, pp. 31-32. [71] R. Lutwak , D. Emmons, T. English, W. Riley, A. Duwel, M. Varghese, D. K. Serkland, and

Laser metrology applied to the nuclear maintenance

International Nuclear Information System (INIS)

Garrido Garcia, J.; Sarti Fernandez, F.

2012-01-01

The development of this paper focuses on providing an overview of the state of the art about laser metrology. This type of equipment combines the measurement philosophy of laser scanning with the great precision of the robotic equipment of auscultation. Getting micron.

Gloss evaluation from soft and hard metrologies.

Science.gov (United States)

Wang, Zihao; Xu, Lihao; Hu, Yu; Mirjalili, Fereshteh; Luo, Ming Ronnier

2017-09-01

Recent advances in bidirectional reflectance distribution function (BRDF) acquisitions have provided a novel approach for appearance measurement and analysis. In particular, since gloss appearance is dependent on the directional reflective properties of surfaces, it is reasonable to leverage the BRDF for gloss evaluation. In this paper, we investigate gloss appearance from both soft metrology and hard metrology. A psychophysical experiment was conducted for the gloss assessment of 47 neutral-color samples. In the evaluation of gloss perception from gloss meter measurements, we report several ambiguous correspondences in the medium gloss range. In order to analyze and explain this phenomenon, the BRDF was acquired and examined using a commercial BRDF measuring device. With an improved correlation-to-visual perception, we propose a two-dimensional gloss model by combining a parameter, the standard deviation of the specular lobe, from Ward's BRDF model with measured gloss values.

An active pixels spectrometers for neutronic fields metrology

International Nuclear Information System (INIS)

Taforeau, Julien

2013-01-01

The fundamental metrology is responsible for the sustainability of the measurement systems and handles to supply the reference standards. Concerning the metrology of ionizing radiations and, in particular the neutron metrology, detectors standards are used to characterize reference fields, in terms of energy and fluence. The dosimeters or particle detectors are calibrated on these reference fields. This thesis presents the development of a neutron spectrometer neutron candidate to the status of primary standard for the characterization of neutron fields in the range from 5 to 20 MeV. The spectrometer uses the recoil proton telescope as detection principle; the CMOS technology, through three sensor positions, is taking advantage to realize the tracking of protons. A Si(Li) detector handles the measure of the residual proton energy. The device simulations, realized under MCNPX, allow to estimate its performances and to validate the neutron energy reconstruction. An essential step of characterization of the telescope elements and in particular of CMOS sensors is also proposed to guarantee the validity of posterior experimental measurements. The tests realized as well in mono-energy fields as in radionuclide source show the very good performances of the system. The quantification of uncertainties indicates an energy estimation with 1.5 % accuracy and a resolution of less than 6 %. The fluence measurement is performed with an uncertainty about 4 to 6%. (author)

Metrology of the radon in air volume activity at the italian radon reference chamber

Energy Technology Data Exchange (ETDEWEB)

Sciocchetti, G.; Cotellessa, G.; Soldano, E.; Pagliari, M. [Istituto Nazionale di Metrologia delle Radiazioni Ionizzanti, ENEA Centro Ricerche Casaccia Roma (Italy)

2006-07-01

The approach of the Italian National Institute of Ionising Radiations (I.N.M.R.I.-ENEA) on radon metrology has been based on a complete and integrated system which can be used to calibrate the main types of {sup 222}Rn in air measuring instruments with international traceability. The Italian radon reference chamber is a research and calibration facility developed at the Casaccia Research Center in Roma. This facility has an inner volume of one m{sup 3}. The wall is a cylindrical stainless steel vessel coupled with an automated climate apparatus operated both at steady and dynamic conditions. The control and data acquisition equipment is based on Radotron system, developed to automate the multitasking management of different sets of radon monitors and climatic sensors. A novel approach for testing passive radon monitors with an alpha track detector exposure standard has been developed. It is based on the direct measurement of radon exposure with a set of passive integrating monitors based on the new ENEA piston radon exposure meter. This paper describes the methodological approach on radon metrology, the status-of-art of experimental apparatus and the standardization procedures. (authors)

Metrology of the radon in air volume activity at the italian radon reference chamber

International Nuclear Information System (INIS)

Sciocchetti, G.; Cotellessa, G.; Soldano, E.; Pagliari, M.

2006-01-01

The approach of the Italian National Institute of Ionising Radiations (I.N.M.R.I.-ENEA) on radon metrology has been based on a complete and integrated system which can be used to calibrate the main types of 222 Rn in air measuring instruments with international traceability. The Italian radon reference chamber is a research and calibration facility developed at the Casaccia Research Center in Roma. This facility has an inner volume of one m 3 . The wall is a cylindrical stainless steel vessel coupled with an automated climate apparatus operated both at steady and dynamic conditions. The control and data acquisition equipment is based on Radotron system, developed to automate the multitasking management of different sets of radon monitors and climatic sensors. A novel approach for testing passive radon monitors with an alpha track detector exposure standard has been developed. It is based on the direct measurement of radon exposure with a set of passive integrating monitors based on the new ENEA piston radon exposure meter. This paper describes the methodological approach on radon metrology, the status-of-art of experimental apparatus and the standardization procedures. (authors)

The Opportunities and Challenges of Bringing New Metrology Equipment to Market

Science.gov (United States)

Perloff, David S.

2005-09-01

This paper provides an overview of the economic and technological factors which are driving the demand for new metrology and inspection equipment, the challenges and opportunities facing new companies in bringing such equipment to market, and the funding environment in which new companies must raise capital to finance their efforts. Seven metrology companies and one inspection equipment company that have received first-time venture backing since 2000 are used to illustrate how these specialized businesses are launched and funded.

Reference metrology in a research fab: the NIST clean calibrations thrust

Science.gov (United States)

Dixson, Ronald; Fu, Joe; Orji, Ndubuisi; Renegar, Thomas; Zheng, Alan; Vorburger, Theodore; Hilton, Al; Cangemi, Marc; Chen, Lei; Hernandez, Mike; Hajdaj, Russell; Bishop, Michael; Cordes, Aaron

2009-03-01

In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) - a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab - a 1765 m2 (19,000 ft2) clean room with 743 m2 (8000 ft2) of class 100 space - is the anchor of this facility and an integral component of the new Center for Nanoscale Science and Technology (CNST) at NIST. Although the CNST/NanoFab is a nanotechnology research facility with a different strategic focus than a current high volume semiconductor fab, metrology tools still play an important role in the nanofabrication research conducted here. Some of the metrology tools available to users of the NanoFab include stylus profiling, scanning electron microscopy (SEM), and atomic force microscopy (AFM). Since 2001, NIST has collaborated with SEMATECH to implement a reference measurement system (RMS) using critical dimension atomic force microscopy (CD-AFM). NIST brought metrology expertise to the table and SEMATECH provided access to leading edge metrology tools in their clean room facility in Austin. Now, in the newly launched "clean calibrations" thrust at NIST, we are implementing the reference metrology paradigm on several tools in the CNST/NanoFab. Initially, we have focused on calibration, monitoring, and uncertainty analysis for a three-tool set consisting of a stylus profiler, an SEM, and an AFM. Our larger goal is the development of new and supplemental calibrations and standards that will benefit from the Class 100 environment available in the NanoFab and offering our customers calibration options that do not require exposing their samples to less clean environments. Toward this end, we have completed a preliminary evaluation of the performance of these instruments. The results of these evaluations suggest that the achievable uncertainties are generally consistent with our measurement goals.

100 Years of radionuclide metrology

International Nuclear Information System (INIS)

Judge, S.M.; Arnold, D.; Chauvenet, B.; Collé, R.; De Felice, P.; García-Toraño, E.; Wätjen, U.

2014-01-01

The discipline of radionuclide metrology at national standards institutes started in 1913 with the certification by Curie, Rutherford and Meyer of the first primary standards of radium. In early years, radium was a valuable commodity and the aim of the standards was largely to facilitate trade. The focus later changed to providing standards for the new wide range of radionuclides, so that radioactivity could be used for healthcare and industrial applications while minimising the risk to patients, workers and the environment. National measurement institutes responded to the changing demands by developing new techniques for realising primary standards of radioactivity. Looking ahead, there are likely to be demands for standards for new radionuclides used in nuclear medicine, an expansion of the scope of the field into quantitative imaging to facilitate accurate patient dosimetry for nuclear medicine, and an increasing need for accurate standards for radioactive waste management and nuclear forensics. - Highlights: • The driving forces for the development of radionuclide metrology. • Radium standards to facilitate trade of this valuable commodity in the early years. • After 1950, focus changes to healthcare and industrial applications. • National Measurement Institutes develop new techniques, standards, and disseminate the best practice in measurement. • Challenges in nuclear medicine, radioactive waste management and nuclear forensics

Fractal Metrology for biogeosystems analysis

Directory of Open Access Journals (Sweden)

V. Torres-Argüelles

2010-11-01

Full Text Available The solid-pore distribution pattern plays an important role in soil functioning being related with the main physical, chemical and biological multiscale and multitemporal processes of this complex system. In the present research, we studied the aggregation process as self-organizing and operating near a critical point. The structural pattern is extracted from the digital images of three soils (Chernozem, Solonetz and "Chocolate" Clay and compared in terms of roughness of the gray-intensity distribution quantified by several measurement techniques. Special attention was paid to the uncertainty of each of them measured in terms of standard deviation. Some of the applied methods are known as classical in the fractal context (box-counting, rescaling-range and wavelets analyses, etc. while the others have been recently developed by our Group. The combination of these techniques, coming from Fractal Geometry, Metrology, Informatics, Probability Theory and Statistics is termed in this paper Fractal Metrology (FM. We show the usefulness of FM for complex systems analysis through a case study of the soil's physical and chemical degradation applying the selected toolbox to describe and compare the structural attributes of three porous media with contrasting structure but similar clay mineralogy dominated by montmorillonites.

Laser generated ultrasound sources using polymer nanocomposites for high frequency metrology

KAUST Repository

Rajagopal, Srinath

2017-11-22

Accurate characterization of ultrasound fields generated by diagnostic and therapeutic transducers is critical for patient safety. This requires hydrophones calibrated to a traceable standard and currently the upper calibration frequency range available to the user community is limited to a frequency of 40 MHz. However, the increasing use of high frequencies for both imaging and therapy necessitates calibrations to frequencies well beyond this range. For this to be possible, a source of high amplitude, broadband, quasi-planar and stable ultrasound fields is required. This is difficult to achieve using conventional piezoelectric sources, but laser generated ultrasound is a promising technique in this regard. In this study, various polymer-carbon nanotube nanocomposites (PNC) were fabricated and tested for their suitability for such an application by varying the polymer type, carbon nanotubes weight content in the polymer, and PNC thickness. A broadband hydrophone was used to measure the peak pressure and bandwidth of the laser generated ultrasound pulse. Peak-positive pressures of up to 8 MPa and −6dB bandwidths of up to 40 MHz were recorded. There is a nonlinear dependence of the peak pressure on the laser fluence and the bandwidth scales inversely proportionally to the peak pressure. The high-pressure plane waves generated from this preliminary investigation has demonstrated that laser generated ultrasound sources are a promising technique for high frequency calibration of hydrophones.

Profile variation impact on FIB cross-section metrology

Science.gov (United States)

Cordes, Aaron; Bunday, Benjamin; Nadeau, Jim

2012-03-01

The focused ion beam (FIB) milling tool is an important component of reference metrology and process characterization, both as a supporting instrument for bulk sample preparation before forwarding to the transmission electron microscope (TEM) and other instruments and as an in situ measurement instrument using angled scanning electron microscopy. As features grow denser, deeper and more demanding, full-profile reference metrology is needed, and this methodology will only grow in importance. Thus, the ability to extract accurate dimensional and profile information out of the crosssectional faces produced by FIB milling is critical. For features that demonstrate perfect symmetry in the plane of the cross section, analyzing images and extracting metrology data are straightforward. However, for industrial materials, symmetry is not a safe assumption: as features shrink, the line edge and sidewall roughness increases as a percentage of the overall feature dimension. Furthermore, with the introduction of more complex architectures such as 3D memory and FinFETs, the areas of greatest interest, such as the intersections of wrap-around gates, cannot be assumed to be symmetrical in any given plane if cut placement is not precisely controlled. Therefore it is important to establish the exact location and repeatability of the cross-section plane, both in terms of coordinate placement and effective angle of the milled surface. To this end, we prepared designed-in line edge roughness samples in the Albany Nanotech facility using SEMATECH's AMAG6 metrology reticle. The samples were thoroughly characterized before being milled by a non-destructive, sidewall-scanning atomic force microscope (AFM). These samples are then milled and measured under varying process and setup parameters using a single-beam FIB with angled SEM. We established methodologies that allow precise alignment of the cut planes of slice-and-view FIB milling to 3D-AFM scan lines to compare repeated sections

Laser metrology in fluid mechanics granulometry, temperature and concentration measurements

CERN Document Server

Boutier, Alain

2013-01-01

In fluid mechanics, non-intrusive measurements are fundamental in order to improve knowledge of the behavior and main physical phenomena of flows in order to further validate codes.The principles and characteristics of the different techniques available in laser metrology are described in detail in this book.Velocity, temperature and concentration measurements by spectroscopic techniques based on light scattered by molecules are achieved by different techniques: laser-induced fluorescence, coherent anti-Stokes Raman scattering using lasers and parametric sources, and absorption sp

Metrology for fire experiments in outdoor conditions

CERN Document Server

Silvani, Xavier

2013-01-01

Natural fires can be considered as scale-dependant, non-linear processes of mass, momentum and heat transport, resulting from a turbulent reactive and radiative fluid medium flowing over a complex medium, the vegetal fuel. In natural outdoor conditions, the experimental study of natural fires at real scale needs the development of an original metrology, one able to capture the large range of time and length scales involved in its dynamic nature and also able to resist the thermal, mechanical and chemical aggression of flames on devices. Robust, accurate and poorly intrusive tools must be carefully set-up and used for gaining very fluctuating data over long periods. These signals also need the development of original post-processing tools that take into account the non-steady nature of their stochastic components. Metrology for Fire Experiments in Outdoor Conditions closely analyzes these features, and also describes measurements techniques, the thermal insulation of fragile electronic systems, data acquisitio...

Handbook of 3D machine vision optical metrology and imaging

CERN Document Server

Zhang, Song

2013-01-01

With the ongoing release of 3D movies and the emergence of 3D TVs, 3D imaging technologies have penetrated our daily lives. Yet choosing from the numerous 3D vision methods available can be frustrating for scientists and engineers, especially without a comprehensive resource to consult. Filling this gap, Handbook of 3D Machine Vision: Optical Metrology and Imaging gives an extensive, in-depth look at the most popular 3D imaging techniques. It focuses on noninvasive, noncontact optical methods (optical metrology and imaging). The handbook begins with the well-studied method of stereo vision and

XPS and angle resolved XPS, in the semiconductor industry: Characterization and metrology control of ultra-thin films

International Nuclear Information System (INIS)

Brundle, C.R.; Conti, Giuseppina; Mack, Paul

2010-01-01

This review discusses the development of X-ray photoelectron spectroscopy, XPS, used as a characterization and metrology method for ultra-thin films in the semiconductor wafer processing industry. After a brief explanation of how the relative roles of XPS and Auger electron spectroscopy, AES, have changed over the last 15 years or so in the semiconductor industry, we go into some detail as to what is implied by metrology, as opposed to characterization, for thin films in the industry, and then describe how XPS, and particularly angle resolved XPS, ARXPS, have been implemented as a metrology 'tool' for thickness, chemical composition, and non-destructive depth profiling, of transistor gate oxide material, a key requirement in front-end processing. We take a historical approach, dealing first with the early use for SiO 2 films on Si(1 0 0), then moving to silicon oxynitride, SiO x N y in detail, and finally and briefly HfO 2 -based material, which is used today in the most advanced devices (32 nm node).

What metrology can do to improve the quality of your atmospheric ammonia measurements

Science.gov (United States)

Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Ferracci, Valerio; Cassidy, Nathan; Hook, Josh; Battersby, Ross M.; Tang, Yuk S.; Stevens, Amy C. M.; Jones, Matthew R.; Braban, Christine F.; Gates, Linda; Hangartner, Markus; Sacco, Paolo; Pagani, Diego; Hoffnagle, John A.; Niederhauser, Bernhard

2017-04-01

dependant permeation of a pure substance through a membrane into a stream of pre-purified matrix gas and subsequent dilution to required amount fractions. All relevant parameters are fully traceable to SI-units. Extractive optical analysers can be connected directly to both, stationary and mobile systems for calibration. Moreover, the resulting gas mixture can also be pressurised into coated cylinders by cryo-filling. The mobile system as well as these cylinders can be applied for calibrations of optical instruments in other laboratories and in the field. In addition, an SI-traceable dilution system based on a cascade of critical orifices has been established to dilute NH3 mixtures in the order of μmol/mol stored in cylinders. It is planned to apply this system to calibrate and re-sample gas mixtures in cylinders due to its very economical gas use. Here we present insights into the development of said infrastructure and results performance tests. Moreover, we include results of the study on adsorption/desorption effects in dry as well as humidified matrix gas into the discussion on the generation of reference gas mixtures. Acknowledgement: This work was supported by the European Metrology Research Programme (EMRP). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

Laser generated ultrasound sources using polymer nanocomposites for high frequency metrology

KAUST Repository

Rajagopal, Srinath

2017-11-22

Accurate characterisation of ultrasound fields generated by diagnostic and therapeutic transducers is critical for patient safety. This requires hydrophones calibrated to a traceable standard. The existing implementation of the primary standard at the National Measurement Institutes, e.g., NPL and PTB, can provide accurate calibration to a maximum frequency of 40MHz. However, the increasing use of high frequencies for both imaging and therapy necessitates calibrations to frequencies well beyond this range. For this to be possible, a source of high amplitude, broadband, quasi-planar and stable ultrasound fields is required. This is difficult to achieve using conventional piezoelectric sources, but laser generated ultrasound is a promising technique in this regard. In this study various polymer-carbon nanotube nanocomposites (PNC) were fabricated and tested for their suitability for such an application.

At-wavelength metrology using the moiré fringe analysis method based on a two dimensional grating interferometer

International Nuclear Information System (INIS)

Wang, Hongchang; Berujon, Sebastien; Pape, Ian; Rutishauser, Simon; David, Christian; Sawhney, Kawal

2013-01-01

A two-dimensional (2D) grating interferometer was used to perform at-wavelength metrology. A Fast Fourier Transform (FFT) of the interferograms recovers the differential X-ray beam phase in two orthogonal directions simultaneously. As an example, the X-ray wavefronts downstream from a Fresnel Zone plate were measured using the moiré fringe analysis method, which requires only a single image. The rotating shearing interferometer technique for moiré fringe analysis was extended from one dimension to two dimensions to carry out absolute wavefront metrology. In addition, the 2D moiré fringes were extrapolated using Gerchberg's method to reduce the boundary artifacts. The advantages and limitations of the phase-stepping method and the moiré fringe analysis method are also discussed. -- Highlights: ► A rapid and sensitive strip test for CPPU (forchlorfenuron) detection is reported. ► Carbon nanoparticles were used for antibody labelling. ► A common flatbed scanner was employed to the quantitate strip spots. ► The new method was successfully applied to the analysis of the field samples

Atomic and molecular spectroscopy with optical-frequency-comb-referenced IR coherent sources

International Nuclear Information System (INIS)

Cancio, P.; Bartalini, S.; De Rosa, M.; Giusfredi, G.; Mazzotti, D.; Maddaloni, P.; Vitiello, M. S.; De Natale, P.

2013-01-01

We provide a review of progress in the development of metrological-grade measurements in atomic and molecular systems through the extension, in the mid-infrared and far-infrared range, of optical frequency combs (OFCs) and the introduction of new techniques and highly coherent sources. (authors)

Metrological legal frame in the field of the photon dosimetry of radiotherapy in Cuba

International Nuclear Information System (INIS)

Walwyn S, G.; Gutierrez L, S.; Gonzalez R, N.

2006-01-01

The Clinical Dosimetry in the planning of the doses to administer to patients under radiant treatment is of great importance. At the moment the clinical dosemeters its are manufactured with a high technology but errors of production or manipulation cannot be discarded that lead to errors in this planning. It also exists, a group of metrological and of operation parameters that are not checked in a routine calibration, and for those that are checked, legal base that restricts its use in cases of bad operation doesn't exist. This motivated to the Cuban standard elaboration NC 352:2005, for the verification of reference dosemeters of radiotherapy, process that trafficked for an exhaustive search and study of standards and international technical reports, selecting as base document, the standard IEC 60731:1997, for essays of approval of model of clinical dosemeters used in radiotherapy. The present article shows the main technical aspects considered and the requirements and verification methods for the declaration of aptitude of the dosemeters. This document constitutes the scientific base for the implementation from a verification service to national level and an important contribution to the standardization of the metrology of ionizing radiations of Cuba. (Author)

National Defense Center of Excellence for Industrial Metrology and 3D Imaging

Science.gov (United States)

2012-10-18

Appendices) W911NF-08-2-0057 - Metrology - FinalReport 100 m to 200 m. For volume determination (e.g., mining , excavations) and topographic mapping...infrastructure, rail systems, mining ), mobile mapping, and security applications. Lockheed Martin has selected the HDL-64E as the main perception...Appendices) W911NF-08-2-0057 - Metrology - FinalReport The Obscurant Penetrating Autosynchronous Lidar ( OPAL ) has been developed as a variant ofNeptec ’s

Optics for Processes, Products and Metrology

Science.gov (United States)

Mather, George

1999-04-01

Optical physics has a variety of applications in industry, including process inspection, coatings development, vision instrumentation, spectroscopy, and many others. Optics has been used extensively in the design of solar energy collection systems and coatings, for example. Also, with the availability of good CCD cameras and fast computers, it has become possible to develop real-time inspection and metrology devices that can accommodate the high throughputs encountered in modern production processes. More recently, developments in moiré interferometry show great promise for applications in the basic metals and electronics industries. The talk will illustrate applications of optics by discussing process inspection techniques for defect detection, part dimensioning, birefringence measurement, and the analysis of optical coatings in the automotive, glass, and optical disc industries. In particular, examples of optical techniques for the quality control of CD-R, MO, and CD-RW discs will be presented. In addition, the application of optical concepts to solar energy collector design and to metrology by moiré techniques will be discussed. Finally, some of the modern techniques and instruments used for qualitative and quantitative material analysis will be presented.

In-situ virtual metrology for the silicon-dioxide etch rate by using optical emission spectroscopy data

International Nuclear Information System (INIS)

Kim, Boomsoo; Hong, Sangjeen

2014-01-01

As a useful tool for process control in a high volume semiconductor manufacturing environment, virtual metrology for the etch rate in a plasma etch process is investigated using optical emission spectroscopy (OES) data. Virtual metrology is a surrogate measurement taken from the process instead of from direct measurement, and it can provide in-situ metrology of a wafer's geometry from a predictive model. A statistical regression model that correlates the selected wavelengths of the optical emission spectra to the etch rate is established using the OES data collected over 20 experimental runs. In addition, an argon actinometry study is employed to quantify the OES data, and it provides valuable insight into the analysis of the OES data. The established virtual metrology model is further verified with an additional 20 runs of data. As a result, the virtual metrology model with both process recipe tool data and in-situ data shows higher prediction accuracy by as much as 56% compared with either the process recipe tool data or the in-situ data alone.

A three-fingered, touch-sensitive, metrological micro-robotic assembly tool

International Nuclear Information System (INIS)

Torralba, Marta; Hastings, D J; Thousand, Jeffery D; Nowakowski, Bartosz K; Smith, Stuart T

2015-01-01

This article describes a metrological, robotic hand to manipulate and measure micrometer size objects. The presented work demonstrates not only assembly operations, but also positioning control and metrology capability. Sample motion is achieved by a commercial positioning stage, which provides XYZ-displacements for assembly of components. A designed and manufactured gripper tool that incorporates 21 degrees-of-freedom for independent alignment of actuators, sensors, and the three fingers of this hand is presented. These fingers can be opened and closed by piezoelectric actuators through levered flexures providing an 80 μm displacement range measured with calibrated opto-interrupter based, knife-edge sensors. The operational ends of the fingers comprise of a quartz tuning fork with a 7 μm diameter 3.2 mm long carbon fiber extending from the end of one tuning fork tine. Finger-tip force-sensing is achieved by the monitoring of individual finger resonances typically at around 32 kHz. Experimental results included are focused on probe performance analysis. Pick and place operation using the three fingers is demonstrated with all fingers being continuously oscillated, a capability not possible with the previous single or two finger tweezer type designs. By monitoring electrical feedback during pick and place operations, changes in the response of the three probes demonstrate the ability to identify both grab and release operations. Component metrology has been assessed by contacting different micro-spheres of diameters 50(±7.5) μm, 135(±20) μm, and 140(±20) μm. These were measured by the micro robot to have diameters of 67, 133, and 126 μm respectively with corresponding deviations of 4.2, 4.9, and 4.3 μm. This deviation in the measured results was primarily due to the manual, joystick-based, contacting of the fingers, difficulties associated with centering the components to the axis of the hand, and lower contact sensitivity for the smallest sphere

Ensuring Food Integrity by Metrology and FAIR Data Principles

Directory of Open Access Journals (Sweden)

Michael Rychlik

2018-05-01

Full Text Available Food integrity is a general term for sound, nutritive, healthy, tasty, safe, authentic, traceable, as well as ethically, safely, environment-friendly, and sustainably produced foods. In order to verify these properties, analytical methods with a higher degree of accuracy, sensitivity, standardization and harmonization and a harmonized system for their application in analytical laboratories are required. In this view, metrology offers the opportunity to achieve these goals. In this perspective article the current global challenges in food analysis and the principles of metrology to fill these gaps are presented. Therefore, the pan-European project METROFOOD-RI within the framework of the European Strategy Forum on Research Infrastructures (ESFRI was developed to establish a strategy to allow reliable and comparable analytical measurements in foods along the whole process line starting from primary producers until consumers and to make all data findable, accessible, interoperable, and re-usable according to the FAIR data principles. The initiative currently consists of 48 partners from 18 European Countries and concluded its “Early Phase” as research infrastructure by organizing its future structure and presenting a proof of concept by preparing, distributing and comprehensively analyzing three candidate Reference Materials (rice grain, rice flour, and oyster tissue and establishing a system how to compile, process, and store the generated data and how to exchange, compare them and make them accessible in data bases.

A survey on coordinate metrology using dimensional X-ray CT

International Nuclear Information System (INIS)

Matsuzaki, Kazuya

2016-01-01

X-ray computed tomography (X-ray CT) has been occupying indispensable position in geometrical and dimensional measurements in industry, which is capable of measuring both external and internal dimensions of industrial products. Since dimensional X-ray CT has problems about ensuring traceability and estimating uncertainty, requirement of developing measurement standard for dimensional X-ray CT is increasing. Some of national metrology institutes (NMIs) including NMIJ have been working on developing measurement standard. In this report, the background of coordinate metrology using dimensional X-ray CT is reviewed. Then, measurement error sources are discussed. Finally, the plan to develop high accuracy dimensional X-ray CT is presented. (author)

An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

Energy Technology Data Exchange (ETDEWEB)

Settens, Charles M. [State Univ. of New York (SUNY), Albany, NY (United States)

2015-01-01

Simultaneous migration of planar transistors to FinFET architectures, the introduction of a plurality of materials to ensure suitable electrical characteristics, and the establishment of reliable multiple patterning lithography schemes to pattern sub-10 nm feature sizes imposes formidable challenges to current in-line dimensional metrologies. Because the shape of a FinFET channel cross-section immediately influences the electrical characteristics, the evaluation of 3D device structures requires measurement of parameters beyond traditional critical dimension (CD), including their sidewall angles, top corner rounding and footing, roughness, recesses and undercuts at single nanometer dimensions; thus, metrologies require sub-nm and approaching atomic level measurement uncertainty. Synchrotron critical dimension small angle X-ray scattering (CD-SAXS) has unique capabilities to non-destructively monitor the cross-section shape of surface structures with single nanometer uncertainty and can perform overlay metrology to sub-nm uncertainty. In this dissertation, we perform a systematic experimental investigation using CD-SAXS metrology on a hierarchy of semiconductor 3D device architectures including, high-aspect-ratio contact holes, H2 annealed Si fins, and a series of grating type samples at multiple points along a FinFET fabrication process increasing in structural intricacy and ending with fully fabricated FinFET. Comparative studies between CD-SAXS metrology and other relevant semiconductor dimensional metrologies, particularly CDSEM, CD-AFM and TEM are used to determine physical limits of CD-SAXS approach for advanced semiconductor samples. CD-SAXS experimental tradeoffs, advice for model-dependent analysis and thoughts on the compatibility with a semiconductor manufacturing environment are discussed.

Applications of surface metrology in firearm identification

International Nuclear Information System (INIS)

Zheng, X; Soons, J; Vorburger, T V; Song, J; Renegar, T; Thompson, R

2014-01-01

Surface metrology is commonly used to characterize functional engineering surfaces. The technologies developed offer opportunities to improve forensic toolmark identification. Toolmarks are created when a hard surface, the tool, comes into contact with a softer surface and causes plastic deformation. Toolmarks are commonly found on fired bullets and cartridge cases. Trained firearms examiners use these toolmarks to link an evidence bullet or cartridge case to a specific firearm, which can lead to a criminal conviction. Currently, identification is typically based on qualitative visual comparison by a trained examiner using a comparison microscope. In 2009, a report by the National Academies called this method into question. Amongst other issues, they questioned the objectivity of visual toolmark identification by firearms examiners. The National Academies recommended the development of objective toolmark identification criteria and confidence limits. The National Institute of Standards and Technology (NIST) have applied its experience in surface metrology to develop objective identification criteria, measurement methods, and reference artefacts for toolmark identification. NIST developed the Standard Reference Material SRM 2460 standard bullet and SRM 2461 standard cartridge case to facilitate quality control and traceability of identifications performed in crime laboratories. Objectivity is improved through measurement of surface topography and application of unambiguous surface similarity metrics, such as the maximum value (ACCF MAX ) of the areal cross correlation function. Case studies were performed on consecutively manufactured tools, such as gun barrels and breech faces, to demonstrate that, even in this worst case scenario, all the tested tools imparted unique surface topographies that were identifiable. These studies provide scientific support for toolmark evidence admissibility in criminal court cases. (paper)

EMRP JRP MetNH3: Towards a Consistent Metrological Infrastructure for Ammonia Measurements in Ambient Air

Science.gov (United States)

Leuenberger, Daiana; Balslev-Harder, David; Braban, Christine F.; Ebert, Volker; Ferracci, Valerio; Gieseking, Bjoern; Hieta, Tuomas; Martin, Nicholas A.; Pascale, Céline; Pogány, Andrea; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

2016-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. In addition to its acidifying effect on natural waters and soils and to the additional nitrogen input to ecosystems, ammonia is an important precursor for secondary aerosol formation in the atmosphere. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation regarding certified reference material (CRM), applicable analytical methods, measurement uncertainty, quality assurance and quality control (QC/QA) procedures as well as in the infrastructure to attain metrological traceability. As shown in a key comparison in 2007, there are even discrepancies between reference materials provided by European National Metrology Institutes (NMIs) at amount fraction levels up to three orders of magnitude higher than ambient air levels. MetNH3 (Metrology for ammonia in ambient air), a three-year project that started in June 2014 in the framework of the European Metrology Research Programme (EMRP), aims to reduce the gap between requirements set by the European emission regulations and state-of-the-art of analytical methods and reference materials. The overarching objective of the JRP is to achieve metrological traceability for ammonia measurements in ambient air from primary certified reference material CRM and instrumental standards to the field level. This requires the successful completion of the three main goals, which have been assigned to three technical work packages: To develop improved reference gas mixtures by static and dynamic gravimetric generation methods Realisation and characterisation of traceable preparative calibration standards (in pressurised cylinders as well as mobile generators) of ammonia amount fractions similar to those in ambient air based on existing methods for other reactive analytes. The

Implantation of the metrological base for dosimetry of X-ray beams used in radiodiagnostic at Minas Gerais, Brazil

International Nuclear Information System (INIS)

Silva, Teogenes A. da; Oliveira, Paulo Marcio C. de; Baptista Neto, Annibal T.; Soares, Carlos Manoel de A.; Nogueira, Maria do S.; Pereira, Elton G.; Squair, Peterson L.; Alonso, Thessa C.

2009-01-01

Viewing the reliability on the X, beta and gamma radiations, the Center for Development of Nuclear Technology (CDTN) has invested in the implantation of a metrological infrastructure to attend the necessities of the radiodiagnostic area with X-rays. This work describes the strategy and the more relevant technical and scientific results

Registration performance on EUV masks using high-resolution registration metrology

Science.gov (United States)

Steinert, Steffen; Solowan, Hans-Michael; Park, Jinback; Han, Hakseung; Beyer, Dirk; Scherübl, Thomas

2016-10-01

Next-generation lithography based on EUV continues to move forward to high-volume manufacturing. Given the technical challenges and the throughput concerns a hybrid approach with 193 nm immersion lithography is expected, at least in the initial state. Due to the increasing complexity at smaller nodes a multitude of different masks, both DUV (193 nm) and EUV (13.5 nm) reticles, will then be required in the lithography process-flow. The individual registration of each mask and the resulting overlay error are of crucial importance in order to ensure proper functionality of the chips. While registration and overlay metrology on DUV masks has been the standard for decades, this has yet to be demonstrated on EUV masks. Past generations of mask registration tools were not necessarily limited in their tool stability, but in their resolution capabilities. The scope of this work is an image placement investigation of high-end EUV masks together with a registration and resolution performance qualification. For this we employ a new generation registration metrology system embedded in a production environment for full-spec EUV masks. This paper presents excellent registration performance not only on standard overlay markers but also on more sophisticated e-beam calibration patterns.

radio frequency based radio frequency based water level monitor

African Journals Online (AJOL)

eobe

ABSTRACT. This paper elucidates a radio frequency (RF) based transmission and reception system used to remotely monitor and .... range the wireless can cover but in this prototype, it ... power supply to the system, the sensed water level is.

Nonlinear Quantum Metrology of Many-Body Open Systems

Science.gov (United States)

Beau, M.; del Campo, A.

2017-07-01

We introduce general bounds for the parameter estimation error in nonlinear quantum metrology of many-body open systems in the Markovian limit. Given a k -body Hamiltonian and p -body Lindblad operators, the estimation error of a Hamiltonian parameter using a Greenberger-Horne-Zeilinger state as a probe is shown to scale as N-[k -(p /2 )], surpassing the shot-noise limit for 2 k >p +1 . Metrology equivalence between initial product states and maximally entangled states is established for p ≥1 . We further show that one can estimate the system-environment coupling parameter with precision N-(p /2 ), while many-body decoherence enhances the precision to N-k in the noise-amplitude estimation of a fluctuating k -body Hamiltonian. For the long-range Ising model, we show that the precision of this parameter beats the shot-noise limit when the range of interactions is below a threshold value.

Metrology of ground-based satellite validation: co-location mismatch and smoothing issues of total ozone comparisons

Directory of Open Access Journals (Sweden)

T. Verhoelst

2015-12-01

Full Text Available Comparisons with ground-based correlative measurements constitute a key component in the validation of satellite data on atmospheric composition. The error budget of these comparisons contains not only the measurement errors but also several terms related to differences in sampling and smoothing of the inhomogeneous and variable atmospheric field. A versatile system for Observing System Simulation Experiments (OSSEs, named OSSSMOSE, is used here to quantify these terms. Based on the application of pragmatic observation operators onto high-resolution atmospheric fields, it allows a simulation of each individual measurement, and consequently, also of the differences to be expected from spatial and temporal field variations between both measurements making up a comparison pair. As a topical case study, the system is used to evaluate the error budget of total ozone column (TOC comparisons between GOME-type direct fitting (GODFITv3 satellite retrievals from GOME/ERS2, SCIAMACHY/Envisat, and GOME-2/MetOp-A, and ground-based direct-sun and zenith–sky reference measurements such as those from Dobsons, Brewers, and zenith-scattered light (ZSL-DOAS instruments, respectively. In particular, the focus is placed on the GODFITv3 reprocessed GOME-2A data record vs. the ground-based instruments contributing to the Network for the Detection of Atmospheric Composition Change (NDACC. The simulations are found to reproduce the actual measurements almost to within the measurement uncertainties, confirming that the OSSE approach and its technical implementation are appropriate. This work reveals that many features of the comparison spread and median difference can be understood as due to metrological differences, even when using strict co-location criteria. In particular, sampling difference errors exceed measurement uncertainties regularly at most mid- and high-latitude stations, with values up to 10 % and more in extreme cases. Smoothing difference errors only

Automation of metrological operations on measuring apparatuses of radiation monitoring system

International Nuclear Information System (INIS)

Kulich, V.; Studeny, J.

1995-01-01

(J.K.)In this paper the measuring apparatuses of ionizing radiation for the radiation monitoring of NPP Dukovany operation is described. The increase of metrological operations number has been made possible only by a timely reconstruction of the laboratory and by computerization of the measuring procedure and of administrative work which consists mainly of recording of a great number information pieces about the observed measuring apparatuses. There are three working places in the laboratory: 1) irradiation gamma stand with cesium-137 sources; 2) irradiation stand with plutonium-beryllium neutron sources; 3) spectrometric working place. With the regard to the uniqueness of the laboratory operation, all the works in the sphere of hardware as well as software has been implemented by own forces. The equipment of the laboratory makes possible to test metrologically all the radiation monitoring apparatuses used in NPP Dukovany. The quantity of operation of he laboratory of ionizing metrology qualifies the proper functioning of the radiation monitoring system, which directly influences the ensurance of nuclear safety of NPP Dukovany

Importance of education and competence maintenance in metrology field (measurement science)

International Nuclear Information System (INIS)

Dobiliene, J; Meskuotiene, A

2015-01-01

For certain tasks in metrology field trained employers might be necessary to fulfill specific requirements. It is important to pay attention that metrologists are responsible for fluent work of devices that belong to huge variety of vide spectrum of measurements. People who perform measurements (that are related to our safety, security or everyday life) with reliable measuring instruments must be sure for trueness of their results or conclusions. So with the purpose to reach the harmony between the ordinary man and his used means it is very important to ensure competence of specialists that are responsible for mentioned harmony implementation. Usually these specialists have a university degree and perform highly specified tasks in science, industry or laboratories. Their task is quite narrow. For example, type approval of measuring instrument or calibration and verification. Due to the fact that the number of such employers and their tasks is relatively small in the field of legal metrology, this paper focuses on the significance of training and qualification of legal metrology officers

Automation of metrological operations on measuring apparatuses of radiation monitoring system

Energy Technology Data Exchange (ETDEWEB)

Kulich, V; Studeny, J [NPP Dukovany (Czech Republic)

1996-12-31

(J.K.)In this paper the measuring apparatuses of ionizing radiation for the radiation monitoring of NPP Dukovany operation is described. The increase of metrological operations number has been made possible only by a timely reconstruction of the laboratory and by computerization of the measuring procedure and of administrative work which consists mainly of recording of a great number information pieces about the observed measuring apparatuses. There are three working places in the laboratory: 1) irradiation gamma stand with cesium-137 sources; 2) irradiation stand with plutonium-beryllium neutron sources; 3) spectrometric working place. With the regard to the uniqueness of the laboratory operation, all the works in the sphere of hardware as well as software has been implemented by own forces. The equipment of the laboratory makes possible to test metrologically all the radiation monitoring apparatuses used in NPP Dukovany. The quantity of operation of he laboratory of ionizing metrology qualifies the proper functioning of the radiation monitoring system, which directly influences the ensurance of nuclear safety of NPP Dukovany.

National Laboratory of Ionizing Radiation Metrology - Brazilian CNEN; Laboratorio Nacional de Metrologia das Radiacoes Ionizantes

Energy Technology Data Exchange (ETDEWEB)

NONE

1993-12-31

The activities of the Brazilian National Laboratory of Ionizing Radiations Metrology are described. They include research and development of metrological techniques and procedures, the calibration of area radiation monitors, clinical dosemeters and other instruments and the preparation and standardization of reference radioactive sources. 4 figs., 13 tabs.

National Laboratory of Ionizing Radiation Metrology - Brazilian CNEN; Laboratorio Nacional de Metrologia das Radiacoes Ionizantes

Energy Technology Data Exchange (ETDEWEB)

NONE

1992-12-31

The activities of the Brazilian National Laboratory of Ionizing Radiations Metrology are described. They include research and development of metrological techniques and procedures, the calibration of area radiation monitors, clinical dosemeters and other instruments and the preparation and standardization of reference radioactive sources. 4 figs., 13 tabs.

Metrology Sampling Strategies for Process Monitoring Applications

KAUST Repository

Vincent, Tyrone L.

2011-11-01

Shrinking process windows in very large scale integration semiconductor manufacturing have already necessitated the development of control systems capable of addressing sub-lot-level variation. Within-wafer control is the next milestone in the evolution of advanced process control from lot-based and wafer-based control. In order to adequately comprehend and control within-wafer spatial variation, inline measurements must be performed at multiple locations across the wafer. At the same time, economic pressures prompt a reduction in metrology, for both capital and cycle-time reasons. This paper explores the use of modeling and minimum-variance prediction as a method to select the sites for measurement on each wafer. The models are developed using the standard statistical tools of principle component analysis and canonical correlation analysis. The proposed selection method is validated using real manufacturing data, and results indicate that it is possible to significantly reduce the number of measurements with little loss in the information obtained for the process control systems. © 2011 IEEE.

Metrological challenges introduced by new tolerancing standards

International Nuclear Information System (INIS)

Morse, Edward; Peng, Yue; Srinivasan, Vijay; Shakarji, Craig

2014-01-01

The recent release of ISO 14405-1 has provided designers with a richer set of specification tools for the size of part features, so that various functional requirements can be captured with greater fidelity. However, these tools also bring new challenges and pitfalls to an inspector using a coordinate metrology system. A sampling strategy that might have worked well in the past could lead to erroneous results that go undetected when used to evaluate these new specifications. In this paper we investigate how measurement strategies for sampled coordinate metrology systems influence different algorithms for the evaluation of these new specifications. Of particular interest are those specifications where the order statistics of feature cross-sections are required. Here the inspector must decide not only how many points are required for an individual cross-section, but the number and spacing of cross-sections measured on the feature. The results of these decisions are compared with an analytic estimate of the ‘true value’ of the measurand specified using this new standard. (paper)

Achieving the Heisenberg limit in quantum metrology using quantum error correction.

Science.gov (United States)

Zhou, Sisi; Zhang, Mengzhen; Preskill, John; Jiang, Liang

2018-01-08

Quantum metrology has many important applications in science and technology, ranging from frequency spectroscopy to gravitational wave detection. Quantum mechanics imposes a fundamental limit on measurement precision, called the Heisenberg limit, which can be achieved for noiseless quantum systems, but is not achievable in general for systems subject to noise. Here we study how measurement precision can be enhanced through quantum error correction, a general method for protecting a quantum system from the damaging effects of noise. We find a necessary and sufficient condition for achieving the Heisenberg limit using quantum probes subject to Markovian noise, assuming that noiseless ancilla systems are available, and that fast, accurate quantum processing can be performed. When the sufficient condition is satisfied, a quantum error-correcting code can be constructed that suppresses the noise without obscuring the signal; the optimal code, achieving the best possible precision, can be found by solving a semidefinite program.

Optical antennas for far and near field metrology

NARCIS (Netherlands)

Silvestri, F.; Bernal Arango, F.; Vendel, K.J.A.; Gerini, G.; Bäumer, S.M.B.; Koenderink, A.F.

2016-01-01

This paper presents the use of optical antennas in metrology scenarios. Two design concepts are presented: dielectric nanoresonator arrays and plasmonic nanoantennas arrays. The first ones are able to focus an incident light beam at an arbitrary focal plane. The nanoantennas arrays can be employed

Metrology for γ-radiation spectrometry in a radiation monitoring system

International Nuclear Information System (INIS)

Khaikovich, I.M.; Shevrygin, O.N.; Fominykh, V.I.

1993-01-01

The rapid measurement of the characteristics of radionuclides is a priority when utilizing nuclear energy because of the needs of environmental conservation. This is particularly the case for long-lived nuclear-fuel fission products, 137,137 Cs, 144 Ce, 60 Co, etc., which as a rule are sources of high-energy γ-radiation. These can be measured by γ-ray spectrometry using scintillation or semiconductor devices. When choosing the metrological models, the starting points are the real characteristics of the distribution of the radionuclides in the soil (rock) and the need to estimate their surface activity and the reserves per unit area, i.e., the parameters from which one can estimate the influence of the radioactivity on nature and can decide the use of land areas. The methodology and the calculations presented show that a single metrological system for radiation monitoring can be constructed using multichannel geophysical radiometers (gamma spectrometers) while relying on a system of initial standard samples of small size. Such a metrological system at present provides all the necessary initial means for measuring the effective γ-radiation surface activity of 137,134 Cs and the mass fraction of the natural radioactive elements. Using these initial means of measurement, surveyed areas in the Leningrad and Tula provinces have been certified as State standard samples in terms of the eight parameters: the surface contamination activity of 137,134 Cs, the reserves of these per unit area, the mass fraction of the natural radioactive elements (potassium, uranium and thorium), the power of the equivalent (exposed) γ-radiation dose at a height of 1 m above the surface. It is intended to use the certified metrological surveyed areas to provide traceability and the required measurement accuracy when studying the contamination in European territories resulting from the accident at the Chernobyl nuclear power station

Surface Slope Metrology on Deformable Soft X-ray Mirrors

International Nuclear Information System (INIS)

Yuan, Sheng; Yashchuk, Valeriy V.; Goldberg, Kenneth A.; Celestre, Rich; Church, Matthew; McKinney, Wayne R.; Morrison, Greg; Warwick, Tony

2010-01-01

We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situ visible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

Surface Slope Metrology on Deformable Soft X-ray Mirrors

International Nuclear Information System (INIS)

Yuan, S.; Yashchuk, V.V.; Goldberg, K.A.; Celestre, R.; Church, M.; McKinney, W.R.; Morrison, G.; Warwick, T.

2009-01-01

We report on the current state of surface slope metrology on deformable mirrors for soft x-rays at the Advanced Light Source (ALS). While we are developing techniques for in situ at-wavelength tuning, we are refining methods of ex situvisible-light optical metrology to achieve sub-100-nrad accuracy. This paper reports on laboratory studies, measurements and tuning of a deformable test-KB mirror prior to its use. The test mirror was bent to a much different optical configuration than its original design, achieving a 0.38 micro-radian residual slope error. Modeling shows that in some cases, by including the image conjugate distance as an additional free parameter in the alignment, along with the two force couples, fourth-order tangential shape errors (the so-called bird shape) can be reduced or eliminated.

Radiation protection metrology in Austria: status and needs in a European perspective

International Nuclear Information System (INIS)

Maringer, F. J.; Leitner, A.; Tschurlovits, M.

2005-01-01

A global harmonised system of radiation protection and radiation dosimetry metrology is required to assure quality and accuracy in exchange of ideas, science, technologies and products. Accurate and high-grade measurements of ionising radiation are required in a wide range of industrial and medical applications where they are critical for human health and safety. This paper presents current work of international and Austrian metrological institutions in the field of ionising radiation and briefly discusses the future need and perspectives in the European context.(author)

Coupling of relative intensity noise and pathlength noise to the length measurement in the optical metrology system of LISA Pathfinder

Science.gov (United States)

Wittchen, Andreas; the LPF Collaboration

2017-05-01

LISA Pathfinder is a technology demonstration mission for the space-based gravitational wave observatory, LISA. It demonstrated that the performance requirements for the interferometric measurement of two test masses in free fall can be met. An important part of the data analysis is to identify the limiting noise sources. [1] This measurement is performed with heterodyne interferometry. The performance of this optical metrology system (OMS) at high frequencies is limited by sensing noise. One such noise source is Relative Intensity Noise (RIN). RIN is a property of the laser, and the photodiode current generated by the interferometer signal contains frequency dependant RIN. From this electric signal the phasemeter calculates the phase change and laser power, and the coupling of RIN into the measurement signal depends on the noise frequency. RIN at DC, at the heterodyne frequency and at two times the heterodyne frequency couples into the phase. Another important noise at high frequencies is path length noise. To reduce the impact this noise is suppressed with a control loop. Path length noise not suppressed will couple directly into the length measurement. The subtraction techniques of both noise sources depend on the phase difference between the reference signal and the measurement signal, and thus on the test mass position. During normal operations we position the test mass at the interferometric zero, which is optimal for noise subtraction purposes. This paper will show results from an in-flight experiment where the test mass position was changed to make the position dependant noise visible.

Information system planning work on maintenance metrological equipment

Directory of Open Access Journals (Sweden)

Dmitry V. Shtoller

2011-05-01

Full Text Available Computerization has entered into all human activities. Important role in the work now is a workstation, which increases productivity. Did not remain without attention and work of the metrological services of enterprises. Electronic records can help solve many problems for the organization of data.

Metrological traceability of carbon dioxide measurements in atmosphere and seawater

International Nuclear Information System (INIS)

Rolle, F; Pessana, E; Sega, M

2017-01-01

The accurate determination of gaseous pollutants is fundamental for the monitoring of the trends of these analytes in the environment and the application of the metrological concepts to this field is necessary to assure the reliability of the measurement results. In this work, an overview of the activity carried out at Istituto Nazionale di Ricerca Metrologica to establish the metrological traceability of the measurements of gaseous atmospheric pollutants, in particular of carbon dioxide (CO 2 ), is presented. Two primary methods, the gravimetry and the dynamic dilution, are used for the preparation of reference standards for composition which can be used to calibrate sensors and analytical instrumentation. At present, research is carried out to lower the measurement uncertainties of the primary gas mixtures and to extend their application to the oceanic field. The reason of such investigation is due to the evidence of the changes occurring in seawater carbonate chemistry, connected to the rising level of CO 2 in the atmosphere. The well established activity to assure the metrological traceability of CO 2 in the atmosphere will be applied to the determination of CO 2 in seawater, by developing suitable reference materials for calibration and control of the sensors during their routine use. (paper)

Tools intented to nuclear metrology

International Nuclear Information System (INIS)

Munayco Tasayco, A.F.

1980-08-01

The study undertaken in the metrological laboratory of the C.E.N. Saclay Electronics Services is intended to improve the measurement methods in two fields concerning nuclear instrumentation: the current's measurement in the range 1pA to 0,01 pA and the study of a measurement's system for the linear circuits used in spectrometer gamma ray with semiconductor. Two systems are now working. Its permit an improvement of precision measurement, an automation of the measurement process and many possibilities in the choice of parameters and the laying-out of results [fr

Primary calibration in acoustics metrology

International Nuclear Information System (INIS)

Milhomem, T A Bacelar; Soares, Z M Defilippo

2015-01-01

SI unit in acoustics is realized by the reciprocity calibrations of laboratory standard microphones in pressure field, free field and diffuse field. Calibrations in pressure field and in free field are already consolidated and the Inmetro already done them. Calibration in diffuse field is not yet consolidated, however, some national metrology institutes, including Inmetro, are conducting researches on this subject. This paper presents the reciprocity calibration, the results of Inmetro in recent key comparisons and the research that is being developed for the implementation of reciprocity calibration in diffuse field

European Congress on Optics Applied to Metrology /METROP/, 2nd, Strasbourg, France, November 26-30, 1979, Proceedings

International Nuclear Information System (INIS)

Grosmann, M.; Meyrueis, P.

1980-01-01

The paper deals with speckle metrology, advances in classical optical metrology and measurement, and holographic metrology. Specific topics include hybrid holographic computer image processing, a speckle method of flow velocity measurement, the measurement of vibratory strains on turbine blades by speckle photography, the use of optical heterodyning and the Doppler effect in laser vibrometers and anemometers, subpicosecond dye lasers for optical metrology, and laser-beam scanning for remote control. Holographic interferometry of brittle materials is discussed, along with a system for the automatic analysis of holographic interferograms, the measurement of surface tension by holographic interferometry, nondestructive testing by means of holographic interferometry, real-time holographic interferometry of heat transfer at the surface of cold solar collectors, and the effective practical use of holography and related technologies in industry

X-diffraction technique applied for nano system metrology

International Nuclear Information System (INIS)

Kuznetsov, Alexei Yu.; Machado, Rogerio; Robertis, Eveline de; Campos, Andrea P.C.; Archanjo, Braulio S.; Gomes, Lincoln S.; Achete, Carlos A.

2009-01-01

The application of nano materials are fast growing in all industrial sectors, with a strong necessity in nano metrology and normalizing in the nano material area. The great potential of the X-ray diffraction technique in this field is illustrated at the example of metals, metal oxides and pharmaceuticals

Metrology challenges for high-rate nanomanufacturing of polymer structures

Science.gov (United States)

Mead, Joey; Barry, Carol; Busnaina, Ahmed; Isaacs, Jacqueline

2012-10-01

The transfer of nanoscience accomplishments into commercial products is hindered by the lack of understanding of barriers to nanoscale manufacturing. We have developed a number of nanomanufacturing processes that leverage available high-rate plastics fabrication technologies. These processes include directed assembly of a variety of nanoelements, such as nanoparticles and nanotubes, which are then transferred onto a polymer substrate for the fabrication of conformal/flexible electronic materials, among other applications. These assembly processes utilize both electric fields and/or chemical functionalization. Conducting polymers and carbon nanotubes have been successfully transferred to a polymer substrate in times less than 5 minutes, which is commercially relevant and can be utilized in a continuous (reel to reel/roll to roll) process. Other processes include continuous high volume mixing of nanoelements (CNTs, etc) into polymers, multi-layer extrusion and 3D injection molding of polymer structures. These nanomanufacturing processes can be used for wide range of applications, including EMI shielding, flexible electronics, structural materials, and novel sensors (specifically for chem/bio detection). Current techniques to characterize the quality and efficacy of the processes are quite slow. Moreover, the instrumentation and metrology needs for these manufacturing processes are varied and challenging. Novel, rapid, in-line metrology to enable the commercialization of these processes is critically needed. This talk will explore the necessary measurement needs for polymer based nanomanufacturing processes for both step and continuous (reel to reel/roll to roll) processes.

The role of metrology in mediating and mobilizing the language and culture of scientific facts

Science.gov (United States)

Fisher, W. P., Jr.; Stenner, A. J.

2015-02-01

The self-conscious awareness of language and its use is arguably nowhere more intense than in metrology. The careful and deliberate coordination and alignment of shared metrological frames of reference for theory, experiment, and practical application have been characteristics of scientific culture at least since the origins of the SI units in revolutionary France. Though close attention has been focused on the logical and analytical aspects of language use in science, little concern has been shown for understanding how the social and historical aspects of everyday language may have foreshadowed and influenced the development and character of metrological language, especially relative to the inevitably partial knowledge possessed by any given stakeholder participating in the scientific enterprise. Insight in this regard may be helpful in discerning how and if an analogous role for metrology might be created in psychology and the social sciences. It may be that the success of psychology as a science will depend less on taking physics as the relevant model than on attending to the interplay of concepts, models, and social organization that make any culture effective.

Quantifying Human Response: Linking metrological and psychometric characterisations of Man as a Measurement Instrument

International Nuclear Information System (INIS)

Pendrill, L R; Fisher, William P Jr

2013-01-01

A better understanding of how to characterise human response is essential to improved person-centred care and other situations where human factors are crucial. Challenges to introducing classical metrological concepts such as measurement uncertainty and traceability when characterising Man as a Measurement Instrument include the failure of many statistical tools when applied to ordinal measurement scales and a lack of metrological references in, for instance, healthcare. The present work attempts to link metrological and psychometric (Rasch) characterisation of Man as a Measurement Instrument in a study of elementary tasks, such as counting dots, where one knows independently the expected value because the measurement object (collection of dots) is prepared in advance. The analysis is compared and contrasted with recent approaches to this problem by others, for instance using signal error fidelity

Frequency stabilized lasers for space applications

Science.gov (United States)

Lieber, Mike; Adkins, Mike; Pierce, Robert; Warden, Robert; Wallace, Cynthia; Weimer, Carl

2014-09-01

metrology, spectroscopy, atomic clocks and geodesy. This technology will be a key enabler to several proposed NASA science missions. Although lasers such as Q-switched Nd-YAG are now commonly used in space, other types of lasers - especially those with narrow linewidth - are still few in number and more development is required to advance their technology readiness. In this paper we discuss a reconfigurable laser frequency stabilization testbed, and end-to-end modeling to support system development. Two important features enabling testbed flexibility are that the controller, signal processing and interfaces are hosted on a field programmable gate array (FPGA) which has spacequalified equivalent parts, and secondly, fiber optic relay of the beam paths. Given the nonlinear behavior of lasers, FPGA implementation is a key system reliability aspect allowing on-orbit retuning of the control system and initial frequency acquisition. The testbed features a dual sensor system, one based upon a high finesse resonator cavity which provides relative stability through Pound-Drever-Hall (PDH) modulation and secondly an absolute frequency reference by dither locking to an acetylene gas cell (GC). To provide for differences between ground and space implementation, we have developed an end-to-end Simulink/ Matlab®-based control system model of the testbed components including the important noise sources. This model is in the process of being correlated to the testbed data which then can be used for trade studies, and estimation of space-based performance and sensitivities. A 1530 nm wavelength semiconductor laser is used for this initial work.

A metrology solution for the orthopaedic industry

International Nuclear Information System (INIS)

Bills, P; Brown, L; Jiang, X; Blunt, L

2005-01-01

Total joint replacement is one of the most common elective surgical procedures performed worldwide, with an estimate of 1.5 million operations performed annually. Currently joint replacements are expected to function for 10-15 years, however, with an increase in life expectancy, and a greater call for knee replacement due to increased activity levels, there is a requirement to improve their function to offer longer term improved quality of life for patients. The amount of wear that a joint incurs is seen as a good indicator of performance, with higher wear rates typically leading to reduced function and premature failure. New technologies and materials are pushing traditional wear assessment methods to their limits, and novel metrology solutions are required to assess wear of joints following in vivo and in vitro use. This paper presents one such measurement technique; a scanning co-ordinate metrology machine for geometrical assessment. A case study is presented to show the application of this technology to a real orthopaedic measurement problem: the wear of components in total knee replacement. This technique shows good results and provides a basis for further developing techniques for geometrical wear assessment of total joint replacements

Metrological approach to quantitative analysis of clinical samples by LA-ICP-MS: A critical review of recent studies.

Science.gov (United States)

Sajnóg, Adam; Hanć, Anetta; Barałkiewicz, Danuta

2018-05-15

Analysis of clinical specimens by imaging techniques allows to determine the content and distribution of trace elements on the surface of the examined sample. In order to obtain reliable results, the developed procedure should be based not only on the properly prepared sample and performed calibration. It is also necessary to carry out all phases of the procedure in accordance with the principles of chemical metrology whose main pillars are the use of validated analytical methods, establishing the traceability of the measurement results and the estimation of the uncertainty. This review paper discusses aspects related to sampling, preparation and analysis of clinical samples by laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) with emphasis on metrological aspects, i.e. selected validation parameters of the analytical method, the traceability of the measurement result and the uncertainty of the result. This work promotes the introduction of metrology principles for chemical measurement with emphasis to the LA-ICP-MS which is the comparative method that requires studious approach to the development of the analytical procedure in order to acquire reliable quantitative results. Copyright © 2018 Elsevier B.V. All rights reserved.

Low Noise Frequency Comb Sources Based on Synchronously Pumped Doubly Resonant Optical Parametric Oscillators

Science.gov (United States)

Wan, Chenchen

Optical frequency combs are coherent light sources consist of thousands of equally spaced frequency lines. Frequency combs have achieved success in applications of metrology, spectroscopy and precise pulse manipulation and control. The most common way to generate frequency combs is based on mode-locked lasers which has the output spectrum of comb structures. To generate stable frequency combs, the output from mode-locked lasers need to be phase stabilized. The whole comb lines will be stabilized if the pulse train repetition rate corresponding to comb spacing and the pulse carrier envelope offset (CEO) frequency are both stabilized. The output from a laser always has fluctuations in parameters known as noise. In laser applications, noise is an important factor to limit the performance and often need to be well controlled. For example in precision measurement such as frequency metrology and precise spectroscopy, low laser intensity and phase noise is required. In mode-locked lasers there are different types of noise like intensity noise, pulse temporal position noise also known as timing jitter, optical phase noise. In term for frequency combs, these noise dynamics is more complex and often related. Understanding the noise behavior is not only of great interest in practical applications but also help understand fundamental laser physics. In this dissertation, the noise of frequency combs and mode-locked lasers will be studied in two projects. First, the CEO frequency phase noise of a synchronously pumped doubly resonant optical parametric oscillators (OPO) will be explored. This is very important for applications of the OPO as a coherent frequency comb source. Another project will focus on the intensity noise coupling in a soliton fiber oscillator, the finding of different noise coupling in soliton pulses and the dispersive waves generated from soliton perturbation can provide very practical guidance for low noise soliton laser design. OPOs are used to generate

Perspectives in absorbed dose metrology with regard to the technical evolutions of external beam radiotherapy

International Nuclear Information System (INIS)

Chauvenet, B.; Bordy, J.M.; Barthe, J.

2009-01-01

This paper presents several R and D axes in absorbed close metrology to meet the needs resulting from the technical evolutions of external beam radiotherapy. The facilities in operation in France have considerably evolved under the impulse of the plan Cancer launched in 2003: replacements and increase of the number of accelerators, substitution of accelerators for telecobalt almost completed and acquisition of innovative facilities for tomo-therapy and stereotaxy. The increasing versatility of facilities makes possible the rapid evolution of treatment modalities, allowing to better delimit irradiation to tumoral tissues and spare surrounding healthy tissues and organs at risk. This leads to a better treatment efficacy through dose escalation. National metrology laboratories must offer responses adapted to the new need, i.e. not restrict themselves to the establishment of references under conventional conditions defined at international level, contribute to the improvement of uncertainties at all levels of reference transfer to practitioners: primary measurements under conditions as close as possible to those of treatment, characterization of transfer and treatment control dosimeters., metrological validation of treatment planning tools... Those axes have been identified as priorities for the next years in ionizing radiation metrology at the European level and included in the European. Metrology Research Programme. A project dealing with some of those topics has been selected in the frame of the Eranet+ Call EMRP 2007 and is now starting. The LNE-LAM is strongly engaged in it. (authors)

Implementation of the Brazilian radiation metrology network

International Nuclear Information System (INIS)

Ramos, Manoel M.O.; Araujo, Margareth M. de

1998-01-01

The ever increasing need for calibration of survey, personal, and contamination meters in Brazil are not completely satisfied by the two operating laboratories. To overcome this deficiency a radiation metrology network is being implemented with the support of IAEA. In a near future this network will count other three calibration laboratories which are being installed in different regions of the country, and accredited through INMETRO. (author)

Development of ITER in-vessel viewing and metrology systems

Energy Technology Data Exchange (ETDEWEB)

Obara, Kenjiro; Kakudate, Satoshi; Nakahira, Masataka; Ito, Akira [Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan). Tokai Research Establishment

1998-04-01

The ITER in-vessel viewing system is vital for detecting and locating damage to in-vessel components such as the blankets and divertors and in monitoring and assisting in-vessel maintenance. This system must be able to operate at high temperature (200degC) under intense gamma radiation ({approx}30 kGy/h) in a high vacuum or 1 bar inert gas. A periscope viewing system was chosen as a reference due to its clear, wide view and a fiberscope viewing system chosen as a backup for viewing in narrow confines. According to the ITER R and D program, both systems and a metrology system are being developed through the joint efforts of Japan, the U.S., and RF Home Teams. This paper outlines design and technology development mainly on periscope in-vessel viewing and laser metrology contributed by the Japan Home Team. (author)

Development of ITER in-vessel viewing and metrology systems

International Nuclear Information System (INIS)

Obara, Kenjiro; Kakudate, Satoshi; Nakahira, Masataka; Ito, Akira

1998-01-01

The ITER in-vessel viewing system is vital for detecting and locating damage to in-vessel components such as the blankets and divertors and in monitoring and assisting in-vessel maintenance. This system must be able to operate at high temperature (200degC) under intense gamma radiation (∼30 kGy/h) in a high vacuum or 1 bar inert gas. A periscope viewing system was chosen as a reference due to its clear, wide view and a fiberscope viewing system chosen as a backup for viewing in narrow confines. According to the ITER R and D program, both systems and a metrology system are being developed through the joint efforts of Japan, the U.S., and RF Home Teams. This paper outlines design and technology development mainly on periscope in-vessel viewing and laser metrology contributed by the Japan Home Team. (author)

Breakthrough In Current In Plane Metrology For Monitoring Large Scale MRAM Production

DEFF Research Database (Denmark)

Cagliani, Alberto; Østerberg, Frederik Westergaard; Hansen, Ole

2017-01-01

The current-in-plane tunneling technique (CIPT) has been a crucial tool in the development of magnetic tunnel junction stacks suitable for Magnetic Random Access Memories (MRAM) for more than a decade. The MRAM development has now reached the maturity to make the transition from R&D to large...... of the Resistance Area product (RA) and the Tunnel Magnetoresistance (TMR) measurements, compared to state of the art CIPT metrology tools dedicated to R&D. On two test wafers, the repeatability of RA and MR was improved up to 350% and the measurement reproducibility up to 1700%. We believe that CIPT metrology now...

GHz band frequency hopping PLL-based frequency synthesizers

Institute of Scientific and Technical Information of China (English)

XU Yong; WANG Zhi-gong; GUAN Yu; XU Zhi-jun; QIAO Lu-feng

2005-01-01

In this paper we describe a full-integrated circuit containing all building blocks of a completed PLL-based synthesizer except for low pass filter(LPF).The frequency synthesizer is designed for a frequency hopping (FH) transceiver operating up to 1.5 GHz as a local oscillator. The architecture of Voltage Controlled Oscillator (VCO) is optimized to get better performance, and a phase noise of -111.85-dBc/Hz @ 1 MHz and a tuning range of 250 MHz are gained at a centre frequency of 1.35 GHz.A novel Dual-Modulus Prescaler(DMP) is designed to achieve a very low jitter and a lower power.The settling time of PLL is 80 μs while the reference frequency is 400 KHz.This monolithic frequency synthesizer is to integrate all main building blocks of PLL except for the low pass filter,with a maximum VCO output frequency of 1.5 GHz,and is fabricated with a 0.18 μm mixed signal CMOS process. Low power dissipation, low phase noise, large tuning range and fast settling time are gained in this design.

High density terahertz frequency comb produced by coherent synchrotron radiation

Science.gov (United States)

Tammaro, S.; Pirali, O.; Roy, P.; Lampin, J.-F.; Ducournau, G.; Cuisset, A.; Hindle, F.; Mouret, G.

2015-07-01

Frequency combs have enabled significant progress in frequency metrology and high-resolution spectroscopy extending the achievable resolution while increasing the signal-to-noise ratio. In its coherent mode, synchrotron radiation is accepted to provide an intense terahertz continuum covering a wide spectral range from about 0.1 to 1 THz. Using a dedicated heterodyne receiver, we reveal the purely discrete nature of this emission. A phase relationship between the light pulses leads to a powerful frequency comb spanning over one decade in frequency. The comb has a mode spacing of 846 kHz, a linewidth of about 200 Hz, a fractional precision of about 2 × 10-10 and no frequency offset. The unprecedented potential of the comb for high-resolution spectroscopy is demonstrated by the accurate determination of pure rotation transitions of acetonitrile.

Industrial Photogrammetry - Accepted Metrology Tool or Exotic Niche

Science.gov (United States)

Bösemann, Werner

2016-06-01

New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]). This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly) illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM's. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

INDUSTRIAL PHOTOGRAMMETRY - ACCEPTED METROLOGY TOOL OR EXOTIC NICHE

Directory of Open Access Journals (Sweden)

W. Bösemann

2016-06-01

Full Text Available New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]. This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM’s. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

Ionising radiation metrology : Physical basis for the radiation protection in Spain

International Nuclear Information System (INIS)

Arcos, J. M. los; Brosed, A.; Fernandez, F.

2004-01-01

Applying radiological protection principles and, in particular optimisation, requires a system of metrological references internationally traceable and to which be traced at the national level, through a well defined calibration chain. In this paper on overview of the activities done in the national standards laboratory and in the calibration laboratories existing in Spain is presented. As a conclusion it is established that, although the necessities at the protection level are reasonably covered for α, β, X and γ radiation, the lack of a neutronic reference laboratory is detected, to give metrological support to the two laboratories with capability for making irradiations or determinations of neutronic doses, currently operating in the country. (Author) 19 refs

Frequency and time transfer for metrology and beyond using telecommunication network fibres

OpenAIRE

Lopez, Olivier; Kéfélian, Fabien; Jiang, Haifeng; Haboucha, Adil; Bercy, Anthony; Stefani, Fabio; Chanteau, Bruno; Kanj, Amale; Rovera, Daniele; Achkar, Joseph; Chardonnet, Christian; Pottie, Paul-Eric; Amy-Klein, Anne; Santarelli, Giorgio

2015-01-01

The distribution and the comparison of an ultra-stable optical frequency and accurate time using optical fibres have been greatly improved in the last ten years. The frequency stability and accuracy of optical links surpass well-established methods using the global navigation satellite system and geostationary satellites. In this paper, we present a review of the methods and the results obtained. We show that public telecommunication network carrying Internet data can be used to compare and d...

Metrology for environment and climate; Metrologie fuer Umwelt und Klima

Energy Technology Data Exchange (ETDEWEB)

Sommer, Klaus-Dieter [Physikalisch-Technische Bundesanstalt (PTB), Braunschweig (Germany). Abt. ' Chemische Physik und Explosionsschutz' ; Spitzer, Petra [Physikalisch-Technische Bundesanstalt (PTB), Braunschweig (Germany). Arbeitsgruppe ' Elektrochemie'

2012-12-15

The author describes the observation and monitoring systems developed by the EU and the Federal Republic of Germany. In this connection the metrological aims are described in connection with the activities of the PTB. (HSI)

Sub-Doppler Frequency Metrology in HD for Tests of Fundamental Physics.

Science.gov (United States)

Cozijn, F M J; Dupré, P; Salumbides, E J; Eikema, K S E; Ubachs, W

2018-04-13

Weak transitions in the (2,0) overtone band of the hydrogen deuteride molecule at λ=1.38  μm were measured in saturated absorption using the technique of noise-immune cavity-enhanced optical heterodyne molecular spectroscopy. Narrow Doppler-free lines were interrogated with a spectroscopy laser locked to a frequency comb laser referenced to an atomic clock to yield transition frequencies [R(1)=217105181895(20)  kHz; R(2)=219042856621(28)  kHz; R(3)=220704304951(28)  kHz] at three orders of magnitude improved accuracy. These benchmark values provide a test of QED in the smallest neutral molecule, and they open up an avenue to resolve the proton radius puzzle, as well as constrain putative fifth forces and extra dimensions.

INNOVATIVE NON-CONTACT METROLOGY SOLUTIONS FOR LARGE OPTICAL TELESCOPES, Phase I

Data.gov (United States)

National Aeronautics and Space Administration — NASA has unique non-contact precision metrology requirements for dimensionally inspecting the global position and orientation of large and highly-polished...

High Performance Computing-Accelerated Metrology for Large Optical Telescopes, Phase II

Data.gov (United States)

National Aeronautics and Space Administration — NASA has unique non-contact precision metrology requirements for dimensionally inspecting the global position and orientation of large and highly-polished...

A universal quantum module for quantum communication, computation, and metrology

Science.gov (United States)

Hanks, Michael; Lo Piparo, Nicolò; Trupke, Michael; Schmiedmayer, Jorg; Munro, William J.; Nemoto, Kae

2017-08-01

In this work, we describe a simple module that could be ubiquitous for quantum information based applications. The basic modules comprises a single NV- center in diamond embedded in an optical cavity, where the cavity mediates interactions between photons and the electron spin (enabling entanglement distribution and efficient readout), while the nuclear spins constitutes a long-lived quantum memories capable of storing and processing quantum information. We discuss how a network of connected modules can be used for distributed metrology, communication and computation applications. Finally, we investigate the possible use of alternative diamond centers (SiV/GeV) within the module and illustrate potential advantages.

222Rn gas metrology in Latvia

International Nuclear Information System (INIS)

Bogucarska, T.; Lapenas, A.

2004-01-01

The measurements of radon gas provides in Latvia according with the State radiation monitoring program. The national standard/reference level for the protection of employees and population from exposure to radon Latvia has been accepted. The facilities for calibration of the radon gas measurement instruments and detectors have been established on basic of the Radiation Metrology and Testing Center which is the local SSDL for Baltic Region. The radon measurement instruments and detectors calibration can be performed at the 170-4000 Bq/m 3 range. (author)

Development of the metrology and imaging of cellulose nanocrystals

International Nuclear Information System (INIS)

Postek, Michael T; Vladár, András; Dagata, John; Farkas, Natalia; Ming, Bin; Wagner, Ryan; Raman, Arvind; Moon, Robert J; Sabo, Ronald; Wegner, Theodore H; Beecher, James

2011-01-01

The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNCs) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement science. Even the largest trees owe their strength to this newly appreciated class of nanomaterials. Cellulose is the world's most abundant natural, renewable, biodegradable polymer. Cellulose occurs as whisker-like microfibrils that are biosynthesized and deposited in plant material in a continuous fashion. The nanocrystals are isolated by hydrolyzing away the amorphous segments leaving the acid resistant crystalline fragments. Therefore, the basic raw material for new nanomaterial products already abounds in nature and is available to be utilized in an array of future materials. However, commercialization requires the development of efficient manufacturing processes and nanometrology to monitor quality. This paper discusses some of the instrumentation, metrology and standards issues associated with the ramping up for production and use of CNCs

Development of the metrology and imaging of cellulose nanocrystals

Science.gov (United States)

Postek, Michael T.; Vladár, András; Dagata, John; Farkas, Natalia; Ming, Bin; Wagner, Ryan; Raman, Arvind; Moon, Robert J.; Sabo, Ronald; Wegner, Theodore H.; Beecher, James

2011-02-01

The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNCs) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement science. Even the largest trees owe their strength to this newly appreciated class of nanomaterials. Cellulose is the world's most abundant natural, renewable, biodegradable polymer. Cellulose occurs as whisker-like microfibrils that are biosynthesized and deposited in plant material in a continuous fashion. The nanocrystals are isolated by hydrolyzing away the amorphous segments leaving the acid resistant crystalline fragments. Therefore, the basic raw material for new nanomaterial products already abounds in nature and is available to be utilized in an array of future materials. However, commercialization requires the development of efficient manufacturing processes and nanometrology to monitor quality. This paper discusses some of the instrumentation, metrology and standards issues associated with the ramping up for production and use of CNCs.

Physical characterization and performance evaluation of an x-ray micro-computed tomography system for dimensional metrology applications

DEFF Research Database (Denmark)

Hiller, Jochen; Maisl, Michael; Reindl, Leonard M

2012-01-01

This paper presents physical and metrological characterization measurements conducted for an industrial x-ray micro-computed tomography (CT) system. As is well known in CT metrology, many factors, e.g., in the scanning and reconstruction process, the image processing, and the 3D data evaluation...... components of a CT scanner, i.e. the x-ray tube and the flat-panel detector, are characterized. The contrast and noise transfer property of the scanner is obtained using image-processing methods based on linear systems theory. A long-term temperature measurement in the scanner cabinet has been carried out....... The dimensional measurement property has been quantified by using a calibrated ball-bar and uncertainty budgeting. Information about the performance of a CT scanner system in terms of contrast and noise transmission and sources of geometrical errors will help plan CT scans more efficiently. In particular...

Brain-computer interface based on intermodulation frequency

Science.gov (United States)

Chen, Xiaogang; Chen, Zhikai; Gao, Shangkai; Gao, Xiaorong

2013-12-01

Objective. Most recent steady-state visual evoked potential (SSVEP)-based brain-computer interface (BCI) systems have used a single frequency for each target, so that a large number of targets require a large number of stimulus frequencies and therefore a wider frequency band. However, human beings show good SSVEP responses only in a limited range of frequencies. Furthermore, this issue is especially problematic if the SSVEP-based BCI takes a PC monitor as a stimulator, which is only capable of generating a limited range of frequencies. To mitigate this issue, this study presents an innovative coding method for SSVEP-based BCI by means of intermodulation frequencies. Approach. Simultaneous modulations of stimulus luminance and color at different frequencies were utilized to induce intermodulation frequencies. Luminance flickered at relatively large frequency (10, 12, 15 Hz), while color alternated at low frequency (0.5, 1 Hz). An attractive feature of the proposed method was that it would substantially increase the number of targets at a single flickering frequency by altering color modulated frequencies. Based on this method, the BCI system presented in this study realized eight targets merely using three flickering frequencies. Main results. The online results obtained from 15 subjects (14 healthy and 1 with stroke) revealed that an average classification accuracy of 93.83% and information transfer rate (ITR) of 33.80 bit min-1 were achieved using our proposed SSVEP-based BCI system. Specifically, 5 out of the 15 subjects exhibited an ITR of 40.00 bit min-1 with a classification accuracy of 100%. Significance. These results suggested that intermodulation frequencies could be adopted as steady responses in BCI, for which our system could be used as a practical BCI system.

Measurement range of phase retrieval in optical surface and wavefront metrology

International Nuclear Information System (INIS)

Brady, Gregory R.; Fienup, James R.

2009-01-01

Phase retrieval employs very simple data collection hardware and iterative algorithms to determine the phase of an optical field. We have derived limitations on phase retrieval, as applied to optical surface and wavefront metrology, in terms of the speed of beam (i.e., f-number or numerical aperture) and amount of aberration using arguments based on sampling theory and geometrical optics. These limitations suggest methodologies for expanding these ranges by increasing the complexity of the measurement arrangement, the phase-retrieval algorithm, or both. We have simulated one of these methods where a surface is measured at unusual conjugates

A method for standardizing the metrological unit of α-track

International Nuclear Information System (INIS)

Liang Xingzhong; Li Qingyang; Li Dianshu

1989-01-01

The conversion from the specialized unit of α-track into the legal metrological unit is described. A circulative method for measuring the transform coefficient is discussed. An experiment about the transform coefficient on a uranium deposit has made

The place of highly accurate methods by RNAA in metrology

International Nuclear Information System (INIS)

Dybczynski, R.; Danko, B.; Polkowska-Motrenko, H.; Samczynski, Z.

2006-01-01

With the introduction of physical metrological concepts to chemical analysis which require that the result should be accompanied by uncertainty statement written down in terms of Sl units, several researchers started to consider lD-MS as the only method fulfilling this requirement. However, recent publications revealed that in certain cases also some expert laboratories using lD-MS and analyzing the same material, produced results for which their uncertainty statements did not overlap, what theoretically should not have taken place. This shows that no monopoly is good in science and it would be desirable to widen the set of methods acknowledged as primary in inorganic trace analysis. Moreover, lD-MS cannot be used for monoisotopic elements. The need for searching for other methods having similar metrological quality as the lD-MS seems obvious. In this paper, our long-time experience on devising highly accurate ('definitive') methods by RNAA for the determination of selected trace elements in biological materials is reviewed. The general idea of definitive methods based on combination of neutron activation with the highly selective and quantitative isolation of the indicator radionuclide by column chromatography followed by gamma spectrometric measurement is reminded and illustrated by examples of the performance of such methods when determining Cd, Co, Mo, etc. lt is demonstrated that such methods are able to provide very reliable results with very low levels of uncertainty traceable to Sl units

Simultaneous acquisition of 3D shape and deformation by combination of interferometric and correlation-based laser speckle metrology.

Science.gov (United States)

Dekiff, Markus; Berssenbrügge, Philipp; Kemper, Björn; Denz, Cornelia; Dirksen, Dieter

2015-12-01

A metrology system combining three laser speckle measurement techniques for simultaneous determination of 3D shape and micro- and macroscopic deformations is presented. While microscopic deformations are determined by a combination of Digital Holographic Interferometry (DHI) and Digital Speckle Photography (DSP), macroscopic 3D shape, position and deformation are retrieved by photogrammetry based on digital image correlation of a projected laser speckle pattern. The photogrammetrically obtained data extend the measurement range of the DHI-DSP system and also increase the accuracy of the calculation of the sensitivity vector. Furthermore, a precise assignment of microscopic displacements to the object's macroscopic shape for enhanced visualization is achieved. The approach allows for fast measurements with a simple setup. Key parameters of the system are optimized, and its precision and measurement range are demonstrated. As application examples, the deformation of a mandible model and the shrinkage of dental impression material are measured.

A simulation-based study on the influence of beam hardening in X-ray computed tomography for dimensional metrology.

Science.gov (United States)

Lifton, Joseph J; Malcolm, Andrew A; McBride, John W

2015-01-01

X-ray computed tomography (CT) is a radiographic scanning technique for visualising cross-sectional images of an object non-destructively. From these cross-sectional images it is possible to evaluate internal dimensional features of a workpiece which may otherwise be inaccessible to tactile and optical instruments. Beam hardening is a physical process that degrades the quality of CT images and has previously been suggested to influence dimensional measurements. Using a validated simulation tool, the influence of spectrum pre-filtration and beam hardening correction are evaluated for internal and external dimensional measurements. Beam hardening is shown to influence internal and external dimensions in opposition, and to have a greater influence on outer dimensions compared to inner dimensions. The results suggest the combination of spectrum pre-filtration and a local gradient-based surface determination method are able to greatly reduce the influence of beam hardening in X-ray CT for dimensional metrology.

Accuracy and Metrological Reliability Enhancing of Thermoelectric Transducers

Directory of Open Access Journals (Sweden)

Bogdan Stadnyk

2010-12-01

Full Text Available This article is devoted to development and use of thermoelectric thermotransducers with an enhanced accuracy and metrological reliability. The actuality of a problem is stipulated. Investigating changes at typical external environments, the mechanisms of transformation function instability are considered; possibilities of thermodynamic presentation use are analyzed concerning a thermometric substance. The algorithm of thermotransducer instrumental errors’ minimization is developed.

Two-dimensional in situ metrology of X-ray mirrors using the speckle scanning technique

Energy Technology Data Exchange (ETDEWEB)

Wang, Hongchang, E-mail: hongchang.wang@diamond.ac.uk; Kashyap, Yogesh; Laundy, David; Sawhney, Kawal [Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot OX11 0DE (United Kingdom)

2015-06-06

The two-dimensional slope error of an X-ray mirror has been retrieved by employing the speckle scanning technique, which will be valuable at synchrotron radiation facilities and in astronomical telescopes. In situ metrology overcomes many of the limitations of existing metrology techniques and is capable of exceeding the performance of present-day optics. A novel technique for precisely characterizing an X-ray bimorph mirror and deducing its two-dimensional (2D) slope error map is presented. This technique has also been used to perform fast optimization of a bimorph mirror using the derived 2D piezo response functions. The measured focused beam size was significantly reduced after the optimization, and the slope error map was then verified by using geometrical optics to simulate the focused beam profile. This proposed technique is expected to be valuable for in situ metrology of X-ray mirrors at synchrotron radiation facilities and in astronomical telescopes.

Methodology for implementation of a national metrology net of radionuclides used in nuclear medicine

International Nuclear Information System (INIS)

Santos, Joyra Amaral dos

2004-01-01

The National Laboratory for Ionizing Radiation Metrology, of the Institute of Radiation Protection and Dosimetry, of the National Commission on Nuclear Energy (IRD/CNEN), comes leading a comparison program for activity measurements of radiopharmaceuticals administered to patients in the Nuclear Medicine Services (NMS) with the purpose to promote the quality control. This work presents a quality assurance program for the performance of such measurements, evaluated in the comparison runs between hospitals and LNMRI, under the statistic point of view and the compliment of regulatory authority norms. The performance of the radionuclides 67 Ga, 123 I, 131 I, 99m Tc and 210 Tl were evaluated and 201 TI have been standardized by absolute methods. Besides, it was established the traceability of the radioactivity standards used in nuclear medicine and a methodology for implementation of a national metrology net of radionuclides. The comparison results prove that the implementation of a radionuclide metrology net is viable, important and feasible. (author)

Research on volume metrology method of large vertical energy storage tank based on internal electro-optical distance-ranging method

Science.gov (United States)

Hao, Huadong; Shi, Haolei; Yi, Pengju; Liu, Ying; Li, Cunjun; Li, Shuguang

2018-01-01

A Volume Metrology method based on Internal Electro-optical Distance-ranging method is established for large vertical energy storage tank. After analyzing the vertical tank volume calculation mathematical model, the key processing algorithms, such as gross error elimination, filtering, streamline, and radius calculation are studied for the point cloud data. The corresponding volume values are automatically calculated in the different liquids by calculating the cross-sectional area along the horizontal direction and integrating from vertical direction. To design the comparison system, a vertical tank which the nominal capacity is 20,000 m3 is selected as the research object, and there are shown that the method has good repeatability and reproducibility. Through using the conventional capacity measurement method as reference, the relative deviation of calculated volume is less than 0.1%, meeting the measurement requirements. And the feasibility and effectiveness are demonstrated.

Ambient Optomechanical Alignment and Pupil Metrology for the Flight Instruments Aboard the James Webb Space Telescope

Science.gov (United States)

Coulter, Phillip; Beaton, Alexander; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hayden, Joseph E.; Hummel, Susann; Hylan, Jason E.; Lee, David; Madison, Timothy J.; Maszkiewicz, Michael;

Advanced X-ray Optics Metrology for Nanofocusing and Coherence Preservation

Energy Technology Data Exchange (ETDEWEB)

Goldberg, Kenneth A.; Yashchuk, Valeriy

2007-12-01

What is the point of developing new high-brightness light sources if beamline optics won't be available to realize the goals of nano-focusing and coherence preservation? That was one of the central questions raised during a workshop at the 2007 Advanced Light Source Users Meeting. Titled, 'Advanced X-Ray Optics Metrology for Nano-focusing and Coherence Preservation', the workshop was organized by Kenneth Goldberg and Valeriy Yashchuk (both of Lawrence Berkeley National Laboratory, LBNL), and it brought together industry representatives and researchers from Japan, Europe, and the US to discuss the state of the art and to outline the optics requirements of new light sources. Many of the presentations are viewable on the workshop website http://goldberg.lbl.gov/MetrologyWorkshop07/. Many speakers shared the same view of one of the most significant challenges facing the development of new high-brightness third and fourth generation x-ray, soft x-ray, and EUV light sources: these sources place extremely high demands on the surface quality of beamline optics. In many cases, the 1-2-nm surface error specs that define the outer bounds of 'diffraction-limited' quality are beyond the reach of leading facilities and optics vendors. To focus light to 50-nm focal spots, or smaller, from reflective optics and to preserve the high coherent flux that new sources make possible, the optical surface quality and alignment tolerances must be measured in nano-meters and nano-radians. Without a significant, well-supported research effort, including the development of new metrology techniques for use both on and off the beamline, these goals will likely not be met. The scant attention this issue has garnered is evident in the stretched budgets and limited manpower currently dedicated to metrology. With many of the world's leading groups represented at the workshop, it became clear that Japan and Europe are several steps ahead of the US in this critical area

Optimal design of tilt carrier frequency computer-generated holograms to measure aspherics.

Science.gov (United States)

Peng, Jiantao; Chen, Zhe; Zhang, Xingxiang; Fu, Tianjiao; Ren, Jianyue

2015-08-20

Computer-generated holograms (CGHs) provide an approach to high-precision metrology of aspherics. A CGH is designed under the trade-off among size, mapping distortion, and line spacing. This paper describes an optimal design method based on the parametric model for tilt carrier frequency CGHs placed outside the interferometer focus points. Under the condition of retaining an admissible size and a tolerable mapping distortion, the optimal design method has two advantages: (1) separating the parasitic diffraction orders to improve the contrast of the interferograms and (2) achieving the largest line spacing to minimize sensitivity to fabrication errors. This optimal design method is applicable to common concave aspherical surfaces and illustrated with CGH design examples.

Measuring up to the challenges of the 21st century. An international evaluation of the Centre for Metrology and Accreditation

Energy Technology Data Exchange (ETDEWEB)

Clapman, P.; Kaarls, R.; Temmes, M.

1997-04-01

The international evaluation of the Centre for Metrology and Accreditation (MIKES) is part of the process in which all relevant industrial and technology policy measures and organizations under the auspices of the Ministry of Trade and Industry (MTI) are being evaluated with the aim of improving their effectiveness. The overall conclusion of the evaluation is that MIKES is serving the country well. An effective national measurement system (FINMET) is being maintained which provides a wide range of calibration services covering most of the nation`s needs. The accreditation service (FINAS) is now well established, is operating effectively, and has good prospects for growth. The evaluators present, however, a number of proposals (including 33 specific recommendations) where they feel that the metrology and accreditation arrangements could be better-suited to meet future national and international challenges. According to the recommendations the Finnish quality policy framework should be developed in a consistent way. There is a need of a comprehensive governmental quality policy statement upon which the inter-ministry coordination and harmonization of various conformity assessment activities can be based. MIKES should retain its current status as an agency within MTI. The national measurement system should be more centralised and a new purpose-built national standards laboratory should be procured. The responsibility for legal metrology should be transferred to MIKES. The terms of reference and membership of Advisory Committee for Metrology, as well as the Advisory Committee for Accreditation should be revised to ensure wider representation of all relevant, and especially industrial interests

Dimensional metrology for process and part quality control in micro manufacturing

DEFF Research Database (Denmark)

Hansen, Hans Nørgaard; Tosello, Guido; Gasparin, Stefania

2011-01-01

dimensions are scaled down and geometrical complexity of objects is increased, the available measurement technologies appear not sufficient. New solutions for measuring principles and instrumentation, tolerancing rules and procedures as well as traceability and calibration are necessary if micro......Micro manufacturing has gained interest over the last decade as the demand for micro mechanical components has increased. The need for dimensional metrology at micro scale is evident both in terms of quality assurance of components and products and in terms of process control. As critical...... manufacturing is to develop into industrial manufacturing solutions. In this paper the application of dimensional precision metrology to both component and process quality control will be demonstrated. The parts investigated are micro injection moulded polymer parts, typical for the field of micro manufacturing....

Metrology in the Bolivia-Brazil Pipeline; Medicao no gasoduro Bolivia-Brasil

Energy Technology Data Exchange (ETDEWEB)

Palhares, Julio C.C.M.; Nunes, Ildemar Pinto [TBG - Transportadora Brasileira Gasoduto Bolivia Brasil S.A., Rio de Janeiro, RJ (Brazil)

2003-07-01

measurement guideline of TBG seeks to be always assisting to the customer's needs and aligned with the changes of the market of natural gas. In five years of existence, TBG attended the forming regulatory legislation and the establishment of the contract fiscal, important marks of the evolution of the market. This work presents the definitions that orientated the metrological issues of TBG, making use of efficient tools in the answers to each demand and seeking to satisfy its own needs, its customers' needs and all the new regulatory demands. This paper approaches, the calibration procedures, the qualification of suppliers, maintenance of the metrological reliability, the daily confirmation of the delivered volumes, the fail treatment, and the unaccounted gas monitoring in rigorous limits practiced in world class companies in foreigner countries. (author)

National Needs for Appearance Metrology

Science.gov (United States)

Nadal, Maria E.

2003-04-01

Appearance greatly influences a customer's judgement of the quality and acceptability of manufactured products, as yearly there is approximately $700 billion worth of shipped goods for which overall appearance is critical to their sale. For example, appearance is reported to be a major factor in about half of automobile purchases. The appearance of an object is the result of a complex interaction of the light field incident upon the object, the scattering and absorption properties of the object, and human perception. The measurable attributes of appearance are divided into color (hue, saturation, and lightness) and geometry (gloss, haze). The nature of the global economy has increased international competition and the need to improve the quality of many manufactured products. Since the manufacturing and marketing of these products is international in scope, the lack of national appearance standard artifacts and measurement protocols results in a direct loss to the supplier. One of the primary missions of the National Institute of Standards and Technology (NIST) is to strengthen the U.S. economy by working with industry to develop and apply technology, measurements and standards. The NIST Physics Laboratory has established an appearance metrology laboratory. This new laboratory provides calibration services for 0^o/45^o color standards and 20^o°, 60^o°, and 85^o° specular gloss, and research in the colorimetric characterization of gonioapparent including a new Standard Reference Material for metallic coatings (SRM 2017) and measurement protocols for pearlescent coatings. These services are NIST's first appearance metrology efforts in many years; a response to needs articulated by industry. These services are designed to meet demands for improved measurements and standards to enhance the acceptability of final products since appearance often plays a major role in their acceptability.

2008 activity report of the French metrology - Ionising radiation; Rapport d'activite 2008 de la metrologie francaise - Rayonnements ionisants

Energy Technology Data Exchange (ETDEWEB)

Anon

2009-07-01

The activities of this section are entrusted to the Henry Becquerel national laboratory (LNE-LNHB), the national laboratory of metrology of the CEA-Saclay, and to the laboratory of dose metrology (LMDN) under the management of IRSN-Cadarache. They treat of ionizing radiations metrology in the domains of activity, photons and charged particles dosimetry, and basic data. This article summarizes the 2008 works carried out at both laboratories: international actions and comparisons, instrumentation improvements, establishment of national references. (J.S.)

Neutron metrology in the HFR

International Nuclear Information System (INIS)

Polle, A.N.; Voorbraak, W.P.

1991-11-01

The experiment R-139-416 for testing the stainless steel type 316L(N) has been irradiated in the HFR Petten. This report presents the final metrology results obtained from activation monitors near the CT-specimen (Compact Tension). Data about the helium production as well as the number of displacements per atom are also included. The irradiation conditions for this experiment, carried out in a REFA-170 type capsule in the HFR position H8, are as close as possible to the conditions of the EFR (European Fast Reactor) above-core structures. The main results of the thermal and fast neutron fluence measurements are presented in table 1 and in figure 1. (author). 10 refs.; 2 figs.; 11 tabs

metrological performance improvement of a superconducting cable test station

CERN Document Server

Montenero, Giuseppe; Ballarino, Amalia

The work presented in this PhD thesis concerns the metrological performance improvement of a superconducting cable test station based on superconducting transformers. The main cable’s parameter to be assessed –as a function of temperature and magnetic field– is the critical current, i.e. beyond this limit the phase transition to the normal state occurs. Ramping the current at levels in the order of the tens of kA can be achieved with superconducting transformers at moderate capital and operational cost. But, issues such as (i) accurate/precise measurements and (ii) monitoring of the secondary current during the device operation have to be addressed. In this regard, the goals of the thesis are the design, prototyping, and validation of a new cryogenic current transducer and effective monitoring system for test stations transformer-based. Among the available transducers for current sensing at room temperature, the DC current transformer (DCCT) provides measurement accuracy in the order of the hundreds of ...

Digital instrumentation and dead-time processing for radionuclide metrology

International Nuclear Information System (INIS)

Censier, B.; Bobin, Ch.; Bouchard, J.

2010-01-01

Most of the acquisition chains used in radionuclide metrology are based on NIM modules. These analogue setups have been thoroughly tested for decades now, becoming a reference in the field. Nevertheless, the renewal of ageing modules and the need for extra features both call for the development of new acquisition schemes based on digital processing. In this article, several technologies usable for instrumentation are first presented. A review of past and present projects is made in the second part, highlighting the fundamental role of dead-time management. The last part is dedicated to the description of two digital systems developed at LNE-LNHB. The first one has been designed for the instrumentation of a NaI(Tl) well-type crystal set-up, while the second one is used for the management of three photomultipliers in the framework of the TDCR method and as a part of the development of a digital platform for coincidence counting. (authors)

Development of laser materials processing and laser metrology techniques

International Nuclear Information System (INIS)

Kim, Cheol Jung; Chung, Chin Man; Kim, Jeong Mook; Kim, Min Suk; Kim, Kwang Suk; Baik, Sung Hoon; Kim, Seong Ouk; Park, Seung Kyu

1997-09-01

The applications of remote laser materials processing and metrology have been investigated in nuclear industry from the beginning of laser invention because they can reduce the risks of workers in the hostile environment by remote operation. The objective of this project is the development of laser material processing and metrology techniques for repairing and inspection to improve the safety of nuclear power plants. As to repairing, we developed our own laser sleeve welding head and innovative optical laser weld monitoring techniques to control the sleeve welding process. Furthermore, we designed and fabricated a 800 W Nd:YAG and a 150 W Excimer laser systems for high power laser materials processing in nuclear industry such as cladding and decontamination. As to inspection, we developed an ESPI and a laser triangulation 3-D profile measurement system for defect detection which can complement ECT and UT inspections. We also developed a scanning laser vibrometer for remote vibration measurement of large structures and tested its performance. (author). 58 refs., 16 tabs., 137 figs

Simple method of generating and distributing frequency-entangled qudits

Science.gov (United States)

Jin, Rui-Bo; Shimizu, Ryosuke; Fujiwara, Mikio; Takeoka, Masahiro; Wakabayashi, Ryota; Yamashita, Taro; Miki, Shigehito; Terai, Hirotaka; Gerrits, Thomas; Sasaki, Masahide

2016-11-01

High-dimensional, frequency-entangled photonic quantum bits (qudits for d-dimension) are promising resources for quantum information processing in an optical fiber network and can also be used to improve channel capacity and security for quantum communication. However, up to now, it is still challenging to prepare high-dimensional frequency-entangled qudits in experiments, due to technical limitations. Here we propose and experimentally implement a novel method for a simple generation of frequency-entangled qudts with d\\gt 10 without the use of any spectral filters or cavities. The generated state is distributed over 15 km in total length. This scheme combines the technique of spectral engineering of biphotons generated by spontaneous parametric down-conversion and the technique of spectrally resolved Hong-Ou-Mandel interference. Our frequency-entangled qudits will enable quantum cryptographic experiments with enhanced performances. This distribution of distinct entangled frequency modes may also be useful for improved metrology, quantum remote synchronization, as well as for fundamental test of stronger violation of local realism.

Historical overview of Ramsey spectroscopy and its relevance on Time and Frequency Metrology

International Nuclear Information System (INIS)

Amaral, M M; Tarelho, L V G; De Souza, M A; Baratto, A C; Garcia, G A; Muller, S T; De Martin, J Jr; Rodriguez, A S; Bebeachibuli, A; Magalhães, D V

2016-01-01

A brief overview of the historical evolution of the method of successive oscillatory fields developed by Norman Ramsey, and some different implementations of the decurrent methodology are presented. We use time and frequency standards, from Cs atomic beams to optical standards, as examples. The scientific progress and the technological implementation achieved through a partnership between USP-SC and INMETRO are shown on the characterization of each time and frequency standard. (paper)

Measurement capabilities of the Bendix Metrology Organization

International Nuclear Information System (INIS)

Barnes, L.M.

1984-01-01

The purpose of this manual is to communicate the measurement and calibration capabilities of the Metrology Organization of the Bendix Kansas City Division. Included is a listing of the measurement types and ranges available, and the accuracies normally attainable under conditions at the Kansas City Division. Also described are currently used standards and measurement devices. The manual is divided into four major sections, each describing a broad general area of measurement: mechanical; environmental, gas, liquid; electrical; and optical and radiation

Digital holography for MEMS and microsystem metrology

CERN Document Server

Asundi, Anand

2011-01-01

Approaching the topic of digital holography from the practical perspective of industrial inspection, Digital Holography for MEMS and Microsystem Metrology describes the process of digital holography and its growing applications for MEMS characterization, residual stress measurement, design and evaluation, and device testing and inspection. Asundi also provides a thorough theoretical grounding that enables the reader to understand basic concepts and thus identify areas where this technique can be adopted. This combination of both practical and theoretical approach will ensure the

Traceability and uncertainty estimation in coordinate metrology

DEFF Research Database (Denmark)

Hansen, Hans Nørgaard; Savio, Enrico; De Chiffre, Leonardo

2001-01-01

National and international standards have defined performance verification procedures for coordinate measuring machines (CMMs) that typically involve their ability to measure calibrated lengths and to a certain extent form. It is recognised that, without further analysis or testing, these results...... are required. Depending on the requirements for uncertainty level, different approaches may be adopted to achieve traceability. Especially in the case of complex measurement situations and workpieces the procedures are not trivial. This paper discusses the establishment of traceability in coordinate metrology...

Nanomanufacturing metrology for cellulosic nanomaterials: an update

Science.gov (United States)

Postek, Michael T.

2014-08-01

The development of the metrology and standards for advanced manufacturing of cellulosic nanomaterials (or basically, wood-based nanotechnology) is imperative to the success of this rising economic sector. Wood-based nanotechnology is a revolutionary technology that will create new jobs and strengthen America's forest-based economy through industrial development and expansion. It allows this, previously perceived, low-tech industry to leap-frog directly into high-tech products and processes and thus improves its current economic slump. Recent global investments in nanotechnology programs have led to a deeper appreciation of the high performance nature of cellulose nanomaterials. Cellulose, manufactured to the smallest possible-size ( 2 nm x 100 nm), is a high-value material that enables products to be lighter and stronger; have less embodied energy; utilize no catalysts in the manufacturing, are biologically compatible and, come from a readily renewable resource. In addition to the potential for a dramatic impact on the national economy - estimated to be as much as $250 billion worldwide by 2020 - cellulose-based nanotechnology creates a pathway for expanded and new markets utilizing these renewable materials. The installed capacity associated with the US pulp and paper industry represents an opportunity, with investment, to rapidly move to large scale production of nano-based materials. However, effective imaging, characterization and fundamental measurement science for process control and characterization are lacking at the present time. This talk will discuss some of these needed measurements and potential solutions.

Coherent Laser Radar Metrology System for Large Scale Optical Systems, Phase II

Data.gov (United States)

National Aeronautics and Space Administration — A new type of laser radar metrology inspection system is proposed that incorporates a novel, dual laser coherent detection scheme capable of eliminating both...

Observations on the Performance of X-Ray Computed Tomography for Dimensional Metrology

Science.gov (United States)

Corcoran, H. C.; Brown, S. B.; Robson, S.; Speller, R. D.; McCarthy, M. B.

2016-06-01

X-ray computed tomography (XCT) is a rising technology within many industries and sectors with a demand for dimensional metrology, defect, void analysis and reverse engineering. There are many variables that can affect the dimensional metrology of objects imaged using XCT, this paper focusses on the effects of beam hardening due to the orientation of the workpiece, in this case a holeplate, and the volume of material the X-rays travel through. Measurements discussed include unidirectional and bidirectional dimensions, radii of cylinders, fit point deviations of the fitted shapes and cylindricity. Results indicate that accuracy and precision of these dimensional measurements are affected in varying amounts, both by the amount of material the X-rays have travelled through and the orientation of the object.

OBSERVATIONS ON THE PERFORMANCE OF X-RAY COMPUTED TOMOGRAPHY FOR DIMENSIONAL METROLOGY

Directory of Open Access Journals (Sweden)

H. C. Corcoran

2016-06-01

Full Text Available X-ray computed tomography (XCT is a rising technology within many industries and sectors with a demand for dimensional metrology, defect, void analysis and reverse engineering. There are many variables that can affect the dimensional metrology of objects imaged using XCT, this paper focusses on the effects of beam hardening due to the orientation of the workpiece, in this case a holeplate, and the volume of material the X-rays travel through. Measurements discussed include unidirectional and bidirectional dimensions, radii of cylinders, fit point deviations of the fitted shapes and cylindricity. Results indicate that accuracy and precision of these dimensional measurements are affected in varying amounts, both by the amount of material the X-rays have travelled through and the orientation of the object.

High-volume manufacturing device overlay process control

Science.gov (United States)

Lee, Honggoo; Han, Sangjun; Woo, Jaeson; Lee, DongYoung; Song, ChangRock; Heo, Hoyoung; Brinster, Irina; Choi, DongSub; Robinson, John C.

2017-03-01

Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay metrology is performed on metrology targets on a high frequency basis including every lot (or most lots) at DI. SEM based FI metrology is performed ondevice in-die as-etched on an infrequent basis. Hybrid control schemes of this type have been in use for many process nodes. What is new is the relative size of the NZO as compared to the overlay spec, and the need to find more comprehensive solutions to characterize and control the size and variability of NZO at the 1x nm node: sampling, modeling, temporal frequency and control aspects, as well as trade-offs between SEM throughput and accuracy.

The origins of the metrology of ionizing radiation

Energy Technology Data Exchange (ETDEWEB)

Paschoa, Anselmo S. [Pontificia Univ. Catolica do Rio de Janeiro, RJ (Brazil). Dept. de Fisica]. E-mail: aspas@itaipu.vdg.fis.puc-rio.br

2000-07-01

Metrology of ionizing radiation started soon after the discovery of radioactivity. However, the modern metrology of ionizing radiation can be considered a by product of the Manhattan Project. When this mammoth effort to produce the first nuclear weapons was initiated, little was known about some of the properties of natural elements, though the phenomenon of natural radioactivity was already known for almost half a century. Less was known about the radioactive materials involved in that project. The amount of those materials which had to be handled were higher than any amount of {sup 226} Ra and {sup 228} Ra ever used thus far. The first atomic piles produced concentration levels of radioactivity much higher than any level known before. There was then a threat not only for the health of hundred of technicians and scientists, but also for thousands of workers. The secrecy involving that project would not allow much to be told about the radioactive hazards. There was, however, the need to protect workers and the public in General against unnecessary exposures to ionizing radiation. The origin of the standards used in radiological protection from pre-world war II and their remarkable evolution during and immediately after this war will be discussed in the paper. (author)

The origins of the metrology of ionizing radiation

International Nuclear Information System (INIS)

Paschoa, Anselmo S.

2000-01-01

Metrology of ionizing radiation started soon after the discovery of radioactivity. However, the modern metrology of ionizing radiation can be considered a by product of the Manhattan Project. When this mammoth effort to produce the first nuclear weapons was initiated, little was known about some of the properties of natural elements, though the phenomenon of natural radioactivity was already known for almost half a century. Less was known about the radioactive materials involved in that project. The amount of those materials which had to be handled were higher than any amount of 226 Ra and 228 Ra ever used thus far. The first atomic piles produced concentration levels of radioactivity much higher than any level known before. There was then a threat not only for the health of hundred of technicians and scientists, but also for thousands of workers. The secrecy involving that project would not allow much to be told about the radioactive hazards. There was, however, the need to protect workers and the public in General against unnecessary exposures to ionizing radiation. The origin of the standards used in radiological protection from pre-world war II and their remarkable evolution during and immediately after this war will be discussed in the paper. (author)

Magnetic properties comparison of mass standards among seventeen national metrology institutes

CSIR Research Space (South Africa)

Becerra, LO

2006-09-01

Full Text Available ), 1, Rue Gaston Boissier, 75015 Paris, France 13 Centro Espa?nol de Metrologia (CEM), c/ del Alfar, 2 ? Apartado 37, 28760 Tres Cantos (Madrid), Spain 14 National Metrology Institute of Japan, National Institute of Advanced Industrial Science...

Metrology for Fuel Cell Manufacturing

Energy Technology Data Exchange (ETDEWEB)

Stocker, Michael [National Inst. of Standards and Technology, Gaithersburg, MD (United States); Stanfield, Eric [National Inst. of Standards and Technology, Gaithersburg, MD (United States)

2015-02-04

The project was divided into three subprojects. The first subproject is Fuel Cell Manufacturing Variability and Its Impact on Performance. The objective was to determine if flow field channel dimensional variability has an impact on fuel cell performance. The second subproject is Non-contact Sensor Evaluation for Bipolar Plate Manufacturing Process Control and Smart Assembly of Fuel Cell Stacks. The objective was to enable cost reduction in the manufacture of fuel cell plates by providing a rapid non-contact measurement system for in-line process control. The third subproject is Optical Scatterfield Metrology for Online Catalyst Coating Inspection of PEM Soft Goods. The objective was to evaluate the suitability of Optical Scatterfield Microscopy as a viable measurement tool for in situ process control of catalyst coatings.

Metrology of reflection optics for synchrotron radiation

International Nuclear Information System (INIS)

Takacs, P.Z.

1985-09-01

Recent years have seen an almost explosive growth in the number of beam lines on new and existing synchrotron radiation facilities throughout the world. The need for optical components to utilize the unique characteristics of synchrotron radiation has increased accordingly. Unfortunately, the technology to manufacture and measure the large, smooth, exotic optical surfaces required to focus and steer the synchrotron radiation beam has not progressed as rapidly as the operational demands on these components. Most companies do not wish to become involved with a project that requires producing a single, very expensive, aspheric optic with surface roughness and figure tolerances that are beyond their capabilities to measure. This paper will review some of the experiences of the National Synchrotron Light Source in procuring grazing incidence optical components over the past several years. We will review the specification process - how it is related to the function of the optic, and how it relates to the metrology available during the manufacturing process and after delivery to the user's laboratory. We will also discuss practical aspects of our experience with new technologies, such as single point diamond turning of metal mirrors and the use of SiC as a mirror material. Recent advances in metrology instrumentation have the potential to move the measurement of surface figure and finish from the research laboratory into the optical shop, which should stimulate growth and interest in the manufacturing of optics to meet the needs of the synchrotron radiation user community

The comparative metrological estimation of methods of emission spectral analysis for wear products in aviation oils

Energy Technology Data Exchange (ETDEWEB)

Alchimov, A B; Drobot, S I; Drokov, V G; Zarubin, V P; Kazmirov, A D; Skodaev, Y D; Podrezov, A M [Applied Physics Institute of Irkutsk State University, Irkutsk (Russian Federation)

1998-12-31

The comparison of different spectral methods of analysis for wear diagnostics of aircraft engines has been carried out. It is shown that known techniques of determination of metals content in aviation oils with the use the spectrometers MFS (Russia) and MOA (USA) give a low accuracy of measurements. As an alternative the method of wear diagnostics on the base of a scintillation spectrometer is suggested. This method possess far better metrological properties in comparison with those on the base of the spectrometer MFS and MOA. (orig.) 6 refs.

The comparative metrological estimation of methods of emission spectral analysis for wear products in aviation oils

Energy Technology Data Exchange (ETDEWEB)

Alchimov, A.B.; Drobot, S.I.; Drokov, V.G.; Zarubin, V.P.; Kazmirov, A.D.; Skodaev, Y.D.; Podrezov, A.M. [Applied Physics Institute of Irkutsk State University, Irkutsk (Russian Federation)

1997-12-31

The comparison of different spectral methods of analysis for wear diagnostics of aircraft engines has been carried out. It is shown that known techniques of determination of metals content in aviation oils with the use the spectrometers MFS (Russia) and MOA (USA) give a low accuracy of measurements. As an alternative the method of wear diagnostics on the base of a scintillation spectrometer is suggested. This method possess far better metrological properties in comparison with those on the base of the spectrometer MFS and MOA. (orig.) 6 refs.

3D-SEM Metrology for Coordinate Measurements at the Nanometer Scale

DEFF Research Database (Denmark)

Carli, Lorenzo

to be addressed concerning uncertainty evaluation have been discussed. Most recent developments in the field of micro and nano-metrology, in terms of measuring machines and techniques, are described pointing out advantages and limitations. The importance of multi-sensor and multi-orientation strategy...

Trapped atomic ions for quantum-limited metrology

Science.gov (United States)

Wineland, David

2017-04-01

Laser-beam-manipulated trapped ions are a candidate for large-scale quantum information processing and quantum simulation but the basic techniques used can also be applied to quantum-limited metrology and sensing. Some examples being explored at NIST are: 1) As charged harmonic oscillators, trapped ions can be used to sense electric fields; this can be used to characterize the electrode-surface-based noisy electric fields that compromise logic-gate fidelities and may eventually be used as a tool in surface science. 2) Since typical qubit logic gates depend on state-dependent forces, we can adapt the gate dynamics to sensitively detect additional forces. 3) We can use extensions of Bell inequality measurements to further restrict the degree of local realism possessed by Bell states. 4) We also briefly describe experiments for creation of Bell states using Hilbert space engineering. This work is a joint effort including the Ion-Storage group, the Quantum processing group, and the Computing and Communications Theory group at NIST, Boulder. Supported by IARPA, ONR, and the NIST Quantum Information Program.

Metrological characteristics of the new BSS2 beta secondary standard system

International Nuclear Information System (INIS)

Reynaldo, Sibele R.

2005-01-01

Due to the increased interest and the importance of beta radiation dosimetry for radiation protection purposes, the Centro de Desenvolvimento da Tecnologia Nuclear. MG, Brazil, acquired the newest Beta Secondary Standard system (BSS2) in order to replace the old BSS1 model, with the goal of implement a beta radiation metrology laboratory and provide the corresponding reference radiation. The new system BSS2, unique in Latin America, requires operational testing and metrological characterization for reliability purposes. For this, some comparative investigations of the two systems were made. The influence of opening and closing the shutter in the final dose of radiation was identified as the highest in the BSS2 in relation to the one founded in BSS1, justified by the structural difference of the shutters of the systems and the reproducibility of source-detector geometry was better in BSS2, because of the robustness of the same

Quantum metrology for gravitational wave astronomy.

Science.gov (United States)

Schnabel, Roman; Mavalvala, Nergis; McClelland, David E; Lam, Ping K

2010-11-16

Einstein's general theory of relativity predicts that accelerating mass distributions produce gravitational radiation, analogous to electromagnetic radiation from accelerating charges. These gravitational waves (GWs) have not been directly detected to date, but are expected to open a new window to the Universe once the detectors, kilometre-scale laser interferometers measuring the distance between quasi-free-falling mirrors, have achieved adequate sensitivity. Recent advances in quantum metrology may now contribute to provide the required sensitivity boost. The so-called squeezed light is able to quantum entangle the high-power laser fields in the interferometer arms, and could have a key role in the realization of GW astronomy.

X-ray metrology for ULSI structures

International Nuclear Information System (INIS)

Bowen, D. K.; Matney, K. M.; Wormington, M.

1998-01-01

Non-destructive X-ray metrological methods are discussed for application to both process development and process control of ULSI structures. X-ray methods can (a) detect the unacceptable levels of internal defects generated by RTA processes in large wafers, (b) accurately measure the thickness and roughness of layers between 1 and 1000 nm thick and (c) can monitor parameters such as crystallographic texture and the roughness of buried interfaces. In this paper we review transmission X-ray topography, thin film texture measurement, grazing-incidence X-ray reflectivity and high-resolution X-ray diffraction. We discuss in particular their suitability as on-line sensors for process control

UPWIND Metrology, Deliverable D 1A2.1, List of measurement Parameters

DEFF Research Database (Denmark)

Hansen, Kurt Schaldemose

performance measurements - Improvement of aerodynamic codes - Assessment of wind resources In general terms the uncertainty of the testing techniques and methods are typically much higher than the need. Since this problem covers many areas of wind energy, the work package is de-fined as a crosscutting...... activity. The problem is especially relevant for the following areas: Production related - Power performance testing especially in wind farms - Testing of turbine improvements in the order of several percent - Testing of aerodynamic codes - Testing of turbine response to effects such as turbulence...... profiles, turbulence, surface shear recovery distances etc) - Measurements of the interaction wind farms and microclimate The objectives of the metrology work package are to develop metrology tools in wind energy to significantly enhance the quality of measurement and testing techniques. The development...

A blueprint for radioanalytical metrology CRMs, intercomparisons, and PE

International Nuclear Information System (INIS)

Inn, Kenneth G.W.; Kurosaki, Hiromu; Frechou, Carole; Gilligan, Chris; Jones, Robert; LaMont, Stephen; Leggitt, Jeff; Li Chunsheng; McCroan, Keith; Swatski, Ronald

2008-01-01

A workshop was held from 28 February to 2 March 2006 at the National Institute of Standards and Technology (NIST) to evaluate the needs for new directions for complex matrix reference materials certified for radionuclide content, interlaboratory comparisons and performance evaluation (PE) programs. The workshop identified new radioanalytical metrology thrust areas needed for environmental, radiobioassay, emergency consequence management, and nuclear forensics, attribution, nonproliferation, and safeguards

Frequency metrology of the acetylene lines near 789 nm from lamb-dip measurements

Science.gov (United States)

Tao, Lei-Gang; Hua, Tian-Peng; Sun, Yu R.; Wang, Jin; Liu, An-Wen; Hu, Shui-Ming

2018-05-01

Lamb-dips of the ro-vibrational lines of 12C2H2 near 789 nm were recorded using cavity ring-down saturation spectroscopy. Calibrated by an optical frequency comb, frequencies of 45 acetylene lines were determined with an accuracy of 1.1 ×10-7 cm-1 (δν / ν = 8 ×10-12), which is over two orders of magnitude more accurate than previous Doppler-limited studies. An averaged shift of about 0.01 cm-1 were found by comparing the upper energies obtained in this work to those recently presented by Chubb et al. from a MARVEL analysis.

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Science.gov (United States)

Bhattacharyya, Kaustuve; Ke, Chih-Ming; Huang, Guo-Tsai; Chen, Kai-Hsiung; Smilde, Henk-Jan H.; Fuchs, Andreas; Jak, Martin; van Schijndel, Mark; Bozkurt, Murat; van der Schaar, Maurits; Meyer, Steffen; Un, Miranda; Morgan, Stephen; Wu, Jon; Tsai, Vincent; Liang, Frida; den Boef, Arie; ten Berge, Peter; Kubis, Michael; Wang, Cathy; Fouquet, Christophe; Terng, L. G.; Hwang, David; Cheng, Kevin; Gau, TS; Ku, Y. C.

2013-04-01

Aggressive on-product overlay requirements in advanced nodes are setting a superior challenge for the semiconductor industry. This forces the industry to look beyond the traditional way-of-working and invest in several new technologies. Integrated metrology2, in-chip overlay control, advanced sampling and process correction-mechanism (using the highest order of correction possible with scanner interface today), are a few of such technologies considered in this publication.

Reference nano-dimensional metrology by scanning transmission electron microscopy

International Nuclear Information System (INIS)

Dai, Gaoliang; Fluegge, Jens; Bosse, Harald; Heidelmann, Markus; Kübel, Christian; Prang, Robby

2013-01-01

Traceable and accurate reference dimensional metrology of nano-structures by scanning transmission electron microscopy (STEM) is introduced in the paper. Two methods, one based on the crystal lattice constant and the other based on the pitch of a feature pair, were applied to calibrate the TEM magnification. The threshold value, which was defined as the half-intensity of boundary materials, is suggested to extract the boundary position of features from the TEM image. Experimental investigations have demonstrated the high potential of the proposed methods. For instance, the standard deviation from ten repeated measurements of a line structure with a nominal 100 nm critical dimension (CD) reaches 1σ = 0.023 nm, about 0.02%. By intentionally introduced defocus and larger sample alignment errors, the investigation shows that these influences may reach 0.20 and 1.3 nm, respectively, indicating the importance of high-quality TEM measurements. Finally, a strategy for disseminating the destructive TEM results is introduced. Using this strategy, the CD of a reference material has been accurately determined. Its agreement over five independent TEM measurements is below 1.2 nm. (paper)

Application of Vision Metrology to In-Orbit Measurement of Large Reflector Onboard Communication Satellite for Next Generation Mobile Satellite Communication

Science.gov (United States)

Akioka, M.; Orikasa, T.; Satoh, M.; Miura, A.; Tsuji, H.; Toyoshima, M.; Fujino, Y.

2016-06-01

Satellite for next generation mobile satellite communication service with small personal terminal requires onboard antenna with very large aperture reflector larger than twenty meters diameter because small personal terminal with lower power consumption in ground base requires the large onboard reflector with high antenna gain. But, large deployable antenna will deform in orbit because the antenna is not a solid dish but the flexible structure with fine cable and mesh supported by truss. Deformation of reflector shape deteriorate the antenna performance and quality and stability of communication service. However, in case of digital beam forming antenna with phased array can modify the antenna beam performance due to adjustment of excitation amplitude and excitation phase. If we can measure the reflector shape precisely in orbit, beam pattern and antenna performance can be compensated with the updated excitation amplitude and excitation phase parameters optimized for the reflector shape measured every moment. Softbank Corporation and National Institute of Information and Communications Technology has started the project "R&D on dynamic beam control technique for next generation mobile communication satellite" as a contracted research project sponsored by Ministry of Internal Affairs and Communication of Japan. In this topic, one of the problem in vision metrology application is a strong constraints on geometry for camera arrangement on satellite bus with very limited space. On satellite in orbit, we cannot take many images from many different directions as ordinary vision metrology measurement and the available area for camera positioning is quite limited. Feasibility of vision metrology application and general methodology to apply to future mobile satellite communication satellite is to be found. Our approach is as follows: 1) Development of prototyping simulator to evaluate the expected precision for network design in zero order and first order 2) Trial

Call for papers for special issue of Journal of Molecular Spectroscopy focusing on "Frequency-comb spectroscopy"

Science.gov (United States)

Foltynowicz, Aleksandra; Picqué, Nathalie; Ye, Jun

2018-05-01

Frequency combs are becoming enabling tools for many applications in science and technology, beyond the original purpose of frequency metrology of simple atoms. The precisely evenly spaced narrow lines of a laser frequency comb inspire intriguing approaches to molecular spectroscopy, designed and implemented by a growing community of scientists. Frequency-comb spectroscopy advances the frontiers of molecular physics across the entire electro-magnetic spectrum. Used as frequency rulers, frequency combs enable absolute frequency measurements and precise line shape studies of molecular transitions, for e.g. tests of fundamental physics and improved determination of fundamental constants. As light sources interrogating the molecular samples, they dramatically improve the resolution, precision, sensitivity and acquisition time of broad spectral-bandwidth spectroscopy and open up new opportunities and applications at the leading edge of molecular spectroscopy and sensing.

Unconditional violation of the shot-noise limit in photonic quantum metrology

Science.gov (United States)

Slussarenko, Sergei; Weston, Morgan M.; Chrzanowski, Helen M.; Shalm, Lynden K.; Verma, Varun B.; Nam, Sae Woo; Pryde, Geoff J.

2017-11-01

Interferometric phase measurement is widely used to precisely determine quantities such as length, speed and material properties1-3. Without quantum correlations, the best phase sensitivity Δ ϕ achievable using n photons is the shot-noise limit, Δ ϕ =1 /√{n }. Quantum-enhanced metrology promises better sensitivity, but, despite theoretical proposals stretching back decades3,4, no measurement using photonic (that is, definite photon number) quantum states has truly surpassed the shot-noise limit. Instead, all such demonstrations, by discounting photon loss, detector inefficiency or other imperfections, have considered only a subset of the photons used. Here, we use an ultrahigh-efficiency photon source and detectors to perform unconditional entanglement-enhanced photonic interferometry. Sampling a birefringent phase shift, we demonstrate precision beyond the shot-noise limit without artificially correcting our results for loss and imperfections. Our results enable quantum-enhanced phase measurements at low photon flux and open the door to the next generation of optical quantum metrology advances.

Legal Time of the Republic of Colombia and its international traceability using the Cesium Atomic Clock - Time and Frequency National Standard

Science.gov (United States)

Hernández Forero, Liz Catherine; Bahamón Cortés, Nelson

2017-06-01

Around the world, there are different providers of timestamp (mobile, radio or television operators, satellites of the GPS network, astronomical measurements, etc.), however, the source of the legal time for a country is either the national metrology institute or another designated laboratory. This activity requires a time standard based on an atomic time scale. The International Bureau of Weights and Measures (BIPM) calculates a weighted average of the time kept in more than 60 nations and produces a single international time scale, called Coordinated Universal Time (UTC). This article presents the current time scale that generates Legal Time for the Republic of Colombia produced by the Instituto Nacional de Metrología (INM) using the time and frequency national standard, a cesium atomic oscillator. It also illustrates how important it is for the academic, scientific and industrial communities, as well as the general public, to be synchronized with this time scale, which is traceable to the International System (SI) of units, through international comparisons that are made in real time.

The UK National Quantum Technologies Hub in sensors and metrology (Keynote Paper)

Science.gov (United States)

Bongs, K.; Boyer, V.; Cruise, M. A.; Freise, A.; Holynski, M.; Hughes, J.; Kaushik, A.; Lien, Y.-H.; Niggebaum, A.; Perea-Ortiz, M.; Petrov, P.; Plant, S.; Singh, Y.; Stabrawa, A.; Paul, D. J.; Sorel, M.; Cumming, D. R. S.; Marsh, J. H.; Bowtell, R. W.; Bason, M. G.; Beardsley, R. P.; Campion, R. P.; Brookes, M. J.; Fernholz, T.; Fromhold, T. M.; Hackermuller, L.; Krüger, P.; Li, X.; Maclean, J. O.; Mellor, C. J.; Novikov, S. V.; Orucevic, F.; Rushforth, A. W.; Welch, N.; Benson, T. M.; Wildman, R. D.; Freegarde, T.; Himsworth, M.; Ruostekoski, J.; Smith, P.; Tropper, A.; Griffin, P. F.; Arnold, A. S.; Riis, E.; Hastie, J. E.; Paboeuf, D.; Parrotta, D. C.; Garraway, B. M.; Pasquazi, A.; Peccianti, M.; Hensinger, W.; Potter, E.; Nizamani, A. H.; Bostock, H.; Rodriguez Blanco, A.; Sinuco-Leon, G.; Hill, I. R.; Williams, R. A.; Gill, P.; Hempler, N.; Malcolm, G. P. A.; Cross, T.; Kock, B. O.; Maddox, S.; John, P.

2016-04-01

The UK National Quantum Technology Hub in Sensors and Metrology is one of four flagship initiatives in the UK National of Quantum Technology Program. As part of a 20-year vision it translates laboratory demonstrations to deployable practical devices, with game-changing miniaturized components and prototypes that transform the state-of-the-art for quantum sensors and metrology. It brings together experts from the Universities of Birmingham, Glasgow, Nottingham, Southampton, Strathclyde and Sussex, NPL and currently links to over 15 leading international academic institutions and over 70 companies to build the supply chains and routes to market needed to bring 10-1000x improvements in sensing applications. It seeks, and is open to, additional partners for new application development and creates a point of easy open access to the facilities and supply chains that it stimulates or nurtures.

Plutonium glove boxes - metrology and operational states

International Nuclear Information System (INIS)

Thyer, A.M.

2001-01-01

The main objective was to undertake a literature review in support of NII's ongoing work in improving safety in the nuclear industry to help define suitable standards of cleanliness for plutonium glove boxes. This is to cover the following areas: existing or proposed national/international standards relating to plutonium glove box cleanliness management; practicable metrology options for assessing the plutonium content of glove boxes; any available dose information relating to the operation of modern and 'old design'; current contamination levels of specific significance (i.e. any accepted level in decommissioning/waste terms, typical criticality limits (if available), any box plutonium loadings that are documented with corresponding operator doses etc.); and, techniques for the decontamination of plutonium glove boxes and their relative effectiveness. This should then form the basis of any further development work undertaken by the UK nuclear industry. Main recommendations are as follows: 1) No information could be found in open literature on acceptable levels of contamination in boxes and action levels for cleanup. If these are not available in closed publications the 2) Where possible, the decontamination methods identified should be tested and dose information recorded against each method to allow informed decisions on which is the optimum technique for a particular form of contamination. 3) Consideration should be given to utilisation of metrology options which have the lowest potential for exposure of operators. Preferred options, may be detection from the outside of boxes using hand-held or permanently located radiation detectors, or semi-intrusive methods such as air-ionisation readings which would require one-off installation of detectors in ductwork

Innovative Ge Quantum Dot Functional Sensing and Metrology Devices

Science.gov (United States)

2017-08-21

Sensing/Metrology Devices Period: May 26th 2015May 25th 2017 Investigators: Pei-Wen Li Affiliation: Department of Electrical Engineering , National...light sources as well as low-power, high-speed Ge photodetectors indeed requires the growth of direct-gap Ge, heterostructure engineering for...All these tasks cannot be simply conducted in terms of bulk Ge technology, and it is no doubt that nanoscience and nanotechnology would offer

Femtosecond Optical Frequency Comb Technology Principle, Operation and Application

CERN Document Server

Ye, Jun

2005-01-01

Over the last few years, there has been a remarkable convergence among the fields of ultrafast optics, optical frequency metrology, and precision laser spectroscopy. This convergence has enabled unprecedented advances in control of the electric field of the pulses produced by femtosecond mode-locked lasers. The resulting spectrum consists of a comb of sharp spectral lines with well-defined frequencies. These new techniques and capabilities are generally known as "femtosecond comb technology." They have had dramatic impact on the diverse fields of precision measurement and extreme nonlinear optical physics. This book provides an introductory description of mode-locked lasers, the connection between time and frequency descriptions of their output and the physical origins of the electric field dynamics, together with an overview of applications of femtosecond comb technology. Individual chapters go into more detail on mode-locked laser development, spectral broadening in microstructure fiber, optical parametric ...

Conceptual design finalisation of the ITER In-Vessel Viewing and Metrology System (IVVS)

Energy Technology Data Exchange (ETDEWEB)

Dubus, Gregory, E-mail: gregory.dubus@f4e.europa.eu [Fusion for Energy, c/ Josep Pla, n°2 - Torres Diagonal Litoral - Edificio B3, 08019 Barcelona (Spain); Puiu, Adrian; Damiani, Carlo; Van Uffelen, Marco; Lo Bue, Alessandro; Izquierdo, Jesus; Semeraro, Luigi [Fusion for Energy, c/ Josep Pla, n°2 - Torres Diagonal Litoral - Edificio B3, 08019 Barcelona (Spain); Martins, Jean-Pierre; Palmer, Jim [ITER Organization, Route de Vinon sur Verdon, 13115 Saint Paul Lez Durance (France)

2013-10-15

The In-Vessel Viewing and Metrology System (IVVS) is a fundamental tool for the ITER machine operations, aiming at performing inspections as well as providing information related to the erosion of in-vessel components. Periodically or on request, the IVVS probes will be deployed into the Vacuum Vessel from their storage positions (still within the ITER primary confinement) in order to perform both viewing and metrology on plasma facing components (blanket, divertor, heating/diagnostic plugs, test blanket modules) and, more generically, to provide information on the status of the in-vessel components. In 2011, the IO proposed to simplify and strengthen the six IVVS port extensions situated at the divertor level. Among other important consequences, such as the relocation of the Glow Discharge Cleaning (GDC) electrodes at other levels of the machine, this major design change implied the need for a substantial redesign of the IVVS plug, which took part to an on-going effort to bring the integrated IVVS concept – including the scanning probe and its deployment system – to the level of maturity suitable for the Conceptual Design Review. This paper gives an overview of the various design and R and D activities in progress: plug design integration, probe concept validation under environmental conditions, development of a metrology strategy, the whole supported by a nuclear analysis.

Albuquerque Regional Training: The Third Seminar on Surface Metrology for the Americas May 12-13 2014

Energy Technology Data Exchange (ETDEWEB)

Tran, Sophie M [Florida State Univ., Tallahassee, FL (United States); Tran, Hy D. [Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

2014-07-01

The Third Seminar on Surface Metrology for the Americas (SSMA) took place in Albuquerque, New Mexico May 12-13, 2014. The conference was at the Marriott Hotel, in the heart of Albuquerque Uptown, within walking distance of many fantastic restaurants. Why surface metrology? Ask Professor Chris Brown of Worcester Polytechnic Institute (WPI), the chair of the first two SSMAs in 2011 and 2012 and the chair of the ASME B46 committee on classification and designation of surface qualities, and Professor Brown responds: “Because surfaces cover everything.”

Stable integrated hyper-parametric oscillator based on coupled optical microcavities.

Science.gov (United States)

Armaroli, Andrea; Feron, Patrice; Dumeige, Yannick

2015-12-01

We propose a flexible scheme based on three coupled optical microcavities that permits us to achieve stable oscillations in the microwave range, the frequency of which depends only on the cavity coupling rates. We find that the different dynamical regimes (soft and hard excitation) affect the oscillation intensity, but not their periods. This configuration may permit us to implement compact hyper-parametric sources on an integrated optical circuit with interesting applications in communications, sensing, and metrology.

Metrology with synchrotron radiation. A short introduction; Metrologie mit Synchrotronstrahlung. Eine kurze Einfuehrung

Energy Technology Data Exchange (ETDEWEB)

Richter, Mathias [Physikalisch-Technische Bundesanstalt (PTB), Berlin (Germany). Fachbereich ' Radiometrie mit Synchrotronstrahlung' ; Ulm, Gerhard

2014-09-15

The beam tubes and measuring places at the Metrology Light Source and BESSY II are listed together with their monochromator types, spectral ranges, spectral resolution powers, photon fluxes, beam sizes, and divergences. (HSI)

Frequency Based Real-time Pricing for Residential Prosumers

Science.gov (United States)

Hambridge, Sarah Mabel

This work is the first to explore frequency based pricing for secondary frequency control as a price-reactive control mechanism for residential prosumers. A frequency based real-time electricity rate is designed as an autonomous market control mechanism for residential prosumers to provide frequency support as an ancillary service. In addition, prosumers are empowered to participate in dynamic energy transactions, therefore integrating Distributed Energy Resources (DERs), and increasing distributed energy storage onto the distributed grid. As the grid transitions towards DERs, a new market based control system will take the place of the legacy distributed system and possibly the legacy bulk power system. DERs provide many benefits such as energy independence, clean generation, efficiency, and reliability to prosumers during blackouts. However, the variable nature of renewable energy and current lack of installed energy storage on the grid will create imbalances in supply and demand as uptake increases, affecting the grid frequency and system operation. Through a frequency-based electricity rate, prosumers will be encouraged to purchase energy storage systems (ESS) to offset their neighbor's distributed generation (DG) such as solar. Chapter 1 explains the deregulation of the power system and move towards Distributed System Operators (DSOs), as prosumers become owners of microgrids and energy cells connected to the distributed system. Dynamic pricing has been proposed as a benefit to prosumers, giving them the ability to make decisions in the energy market, while also providing a way to influence and control their behavior. Frequency based real-time pricing is a type of dynamic pricing which falls between price-reactive control and transactive control. Prosumer-to-prosumer transactions may take the place of prosumer-to-utility transactions, building The Energy Internet. Frequency based pricing could be a mechanism for determining prosumer prices and supporting

STAT, GAPS, STRAIN, DRWDIM: a system of computer codes for analyzing HTGR fuel test element metrology data. User's manual

Energy Technology Data Exchange (ETDEWEB)

Saurwein, J.J.

1977-08-01

A system of computer codes has been developed to statistically reduce Peach Bottom fuel test element metrology data and to compare the material strains and fuel rod-fuel hole gaps computed from these data with HTGR design code predictions. The codes included in this system are STAT, STRAIN, GAPS, and DRWDIM. STAT statistically evaluates test element metrology data yielding fuel rod, fuel body, and sleeve irradiation-induced strains; fuel rod anisotropy; and additional data characterizing each analyzed fuel element. STRAIN compares test element fuel rod and fuel body irradiation-induced strains computed from metrology data with the corresponding design code predictions. GAPS compares test element fuel rod, fuel hole heat transfer gaps computed from metrology data with the corresponding design code predictions. DRWDIM plots the measured and predicted gaps and strains. Although specifically developed to expedite the analysis of Peach Bottom fuel test elements, this system can be applied, without extensive modification, to the analysis of Fort St. Vrain or other HTGR-type fuel test elements.

Improving the accuracy of CT dimensional metrology by a novel beam hardening correction method

International Nuclear Information System (INIS)

Zhang, Xiang; Li, Lei; Zhang, Feng; Xi, Xiaoqi; Deng, Lin; Yan, Bin

2015-01-01

Its powerful nondestructive characteristics are attracting more and more research into the study of computed tomography (CT) for dimensional metrology, which offers a practical alternative to the common measurement methods. However, the inaccuracy and uncertainty severely limit the further utilization of CT for dimensional metrology due to many factors, among which the beam hardening (BH) effect plays a vital role. This paper mainly focuses on eliminating the influence of the BH effect in the accuracy of CT dimensional metrology. To correct the BH effect, a novel exponential correction model is proposed. The parameters of the model are determined by minimizing the gray entropy of the reconstructed volume. In order to maintain the consistency and contrast of the corrected volume, a punishment term is added to the cost function, enabling more accurate measurement results to be obtained by the simple global threshold method. The proposed method is efficient, and especially suited to the case where there is a large difference in gray value between material and background. Different spheres with known diameters are used to verify the accuracy of dimensional measurement. Both simulation and real experimental results demonstrate the improvement in measurement precision. Moreover, a more complex workpiece is also tested to show that the proposed method is of general feasibility. (paper)

Metrology as part and parcel of training programmes for science and engineering

NARCIS (Netherlands)

Regtien, Paulus P.L.

2007-01-01

At many universities and training institutes education in metrology or measurement science is in strong competition with upcoming disciplines. Its importance for science and engineering remains, however, evident. Advanced instruments make measuring almost a routine activity, but it is shown that a

Thermal-Diffusivity-Based Frequency References in Standard CMOS

NARCIS (Netherlands)

Kashmiri, S.M.

2012-01-01

In recent years, a lot of research has been devoted to the realization of accurate integrated frequency references. A thermal-diffusivity-based (TD) frequency reference provides an alternative method of on-chip frequency generation in standard CMOS technology. A frequency-locked loop locks the

Statistical metrology - measurement and modeling of variation for advanced process development and design rule generation

International Nuclear Information System (INIS)

Boning, Duane S.; Chung, James E.

1998-01-01

Advanced process technology will require more detailed understanding and tighter control of variation in devices and interconnects. The purpose of statistical metrology is to provide methods to measure and characterize variation, to model systematic and random components of that variation, and to understand the impact of variation on both yield and performance of advanced circuits. Of particular concern are spatial or pattern-dependencies within individual chips; such systematic variation within the chip can have a much larger impact on performance than wafer-level random variation. Statistical metrology methods will play an important role in the creation of design rules for advanced technologies. For example, a key issue in multilayer interconnect is the uniformity of interlevel dielectric (ILD) thickness within the chip. For the case of ILD thickness, we describe phases of statistical metrology development and application to understanding and modeling thickness variation arising from chemical-mechanical polishing (CMP). These phases include screening experiments including design of test structures and test masks to gather electrical or optical data, techniques for statistical decomposition and analysis of the data, and approaches to calibrating empirical and physical variation models. These models can be integrated with circuit CAD tools to evaluate different process integration or design rule strategies. One focus for the generation of interconnect design rules are guidelines for the use of 'dummy fill' or 'metal fill' to improve the uniformity of underlying metal density and thus improve the uniformity of oxide thickness within the die. Trade-offs that can be evaluated via statistical metrology include the improvements to uniformity possible versus the effect of increased capacitance due to additional metal

Physics colloquium: Single-electron counting in quantum metrology and in statistical mechanics

CERN Multimedia

Geneva University

2011-01-01

GENEVA UNIVERSITY Ecole de physique Département de physique nucléaire et corspusculaire 24, quai Ernest-Ansermet 1211 Genève 4 Tél.: (022) 379 62 73 Fax: (022) 379 69 92olé   Lundi 17 octobre 2011 17h00 - Ecole de Physique, Auditoire Stueckelberg PHYSICS COLLOQUIUM « Single-electron counting in quantum metrology and in statistical mechanics » Prof. Jukka Pekola Low Temperature Laboratory, Aalto University Helsinki, Finland   First I discuss the basics of single-electron tunneling and its potential applications in metrology. My main focus is in developing an accurate source of single-electron current for the realization of the unit ampere. I discuss the principle and the present status of the so-called single- electron turnstile. Investigation of errors in transporting electrons one by one has revealed a wealth of observations on fundamental phenomena in mesoscopic superconductivity, including individual Andreev...

Quantum metrology subject to spatially correlated Markovian noise: restoring the Heisenberg limit

International Nuclear Information System (INIS)

Jeske, Jan; Cole, Jared H; Huelga, Susana F

2014-01-01

Environmental noise can hinder the metrological capabilities of entangled states. While the use of entanglement allows for Heisenberg-limited resolution, the largest permitted by quantum mechanics, deviations from strictly unitary dynamics quickly restore the standard scaling dictated by the central limit theorem. Product and maximally entangled states become asymptotically equivalent when the noisy evolution is both local and strictly Markovian. However, temporal correlations in the noise have been shown to lift this equivalence while fully (spatially) correlated noise allows for the identification of decoherence-free subspaces. Here we analyze precision limits in the presence of noise with finite correlation length and show that there exist robust entangled state preparations which display persistent Heisenberg scaling despite the environmental decoherence, even for small correlation length. Our results emphasize the relevance of noise correlations in the study of quantum advantage and could be relevant beyond metrological applications. (paper)

Carbon nanotube transistor based high-frequency electronics

Science.gov (United States)

Schroter, Michael

At the nanoscale carbon nanotubes (CNTs) have higher carrier mobility and carrier velocity than most incumbent semiconductors. Thus CNT based field-effect transistors (FETs) are being considered as strong candidates for replacing existing MOSFETs in digital applications. In addition, the predicted high intrinsic transit frequency and the more recent finding of ways to achieve highly linear transfer characteristics have inspired investigations on analog high-frequency (HF) applications. High linearity is extremely valuable for an energy efficient usage of the frequency spectrum, particularly in mobile communications. Compared to digital applications, the much more relaxed constraints for CNT placement and lithography combined with already achieved operating frequencies of at least 10 GHz for fabricated devices make an early entry in the low GHz HF market more feasible than in large-scale digital circuits. Such a market entry would be extremely beneficial for funding the development of production CNTFET based process technology. This talk will provide an overview on the present status and feasibility of HF CNTFET technology will be given from an engineering point of view, including device modeling, experimental results, and existing roadblocks. Carbon nanotube transistor based high-frequency electronics.

Fluid-flow-rate metrology: laboratory uncertainties and traceabilities

Science.gov (United States)

Mattingly, G. E.

1991-03-01

Increased concerns for improved fluid flowrate measurement are driving the fluid metering community-meter manufacturers and users alike-to search for better verification and documentation for their fluid measurements. These concerns affect both our domestic and international market places they permeate our technologies - aerospace chemical processes automotive bioengineering etc. They involve public health and safety and they impact our national defense. These concerns are based upon the rising value of fluid resources and products and the importance of critical material accountability. These values directly impact the accuracy needs of fluid buyers and sellers in custody transfers. These concerns impact the designers and operators of chemical process systems where control and productivity optimization depend critically upon measurement precision. Public health and safety depend upon the quality of numerous pollutant measurements - both liquid and gaseous. The performance testing of engines - both automotive and aircraft are critically based upon accurate fuel measurements - both liquid and oxidizer streams. Fluid flowrate measurements are established differently from counterparts in length and mass measurement systems because these have the benefits of " identity" standards. For rate measurement systems the metrology is based upon " derived standards" . These use facilities and transfer standards which are designed built characterized and used to constitute basic measurement capabilities and quantify performance - accuracy and precision. Because " identity standards" do not exist for flow measurements facsimiles or equivalents must

Nuclear forensics-metrological basis for legal defensibility

International Nuclear Information System (INIS)

Leggitt, J.; Inn, K.; Goldberg, S.; Essex, R.; LaMont, S.; Chase, S.

2009-01-01

The admissibility of nuclear forensics measurements and opinions derived from them in US Federal and State courts are based on criteria established by the US Supreme Court in the case of Daubert v. Merrell Dow and the 2000 Amendment of Rule 702 of the Federal Rules of Evidence. These criteria are being addressed by new efforts that include the development of certified reference materials (CRMs) to provide the basis for analytical method development, optimization, calibration, validation, quality control, testing, readiness, and declaration of measurement uncertainties. Quality data is crucial for all stages of the program, from R and D, and database development, to actual casework. Weakness at any point in the program can propagate to reduce the confidence of final conclusions. The new certified reference materials will provide the necessary means to demonstrate a high level of metrological rigor for nuclear forensics evidence and will form a foundation for legally defensible nuclear chemical analysis. The CRMs will allow scientists to devise validated analytical methods, which can be corroborated by independent analytical laboratories. CRMs are required for ISO accreditation of many different analytical techniques which may be employed in the analysis of interdicted nuclear materials. (author)

Theory of a metrology for the earths magnetic field based on the resonance of polarised atomic nuclei (1962); Theorie d'une metrologie du champ magnetique terrestre basee sur la resonance de noyaux atomiques polarises (1962)

Energy Technology Data Exchange (ETDEWEB)

Bonnet, G [Commissariat a l' Energie Atomique, Grenoble (France). Centre d' Etudes Nucleaires

1961-06-15

The problems presented by the metrology of the earths field are studied from two points of view. a. The first, purely physical, concerns the study of NMR transducers in their role for the transformation of the magnetic field into a frequency. The possibilities and limitations are outlined. The use of an equivalent model is introduced systematically in the considerations of NMR phenomena, this makes it possible to treat all problems of interaction between a spin system and an electric detection system in a unified form. b. The other point of view concerns the restitution of the nuclear signal frequency in the form of a directly perceptible observable. The treatment of information is considered from a statistical angle, which leads to the study of an optimisation process concerning the linearization of the measurement as well as the minimisation of noise effects. (author) [French] Les problemes que pose la metrologie du champ terrestre sont etudies sous un double aspect: a. L'un, purement physique, concerne l'etude des traducteurs a RMN dans leur role de transformation du champ magnetique en une frequence. On en degage les possibilites et les limitations. L'emploi d'un modele equivalent est introduit de maniere systematique pour rendre compte des phenomenes de RMN, ce qui permet de traiter sous forme unifiee tous les problemes d'interaction entre un systeme de spins et un systeme electrique de detection. b. L'autre aspect concerne la restitution de la frequence du signal nucleaire sous la forme d'une observable directement perceptible. On considere le traitement de l'information sous l'aspect statistique, ce qui amene a etudier un processus d'optimisation concernant la linearisation de la mesure aussi bien que la minimisation des effets des bruits. (auteur)

The coming of age of the first hybrid metrology software platform dedicated to nanotechnologies (Conference Presentation)

Science.gov (United States)

Foucher, Johann; Labrosse, Aurelien; Dervillé, Alexandre; Zimmermann, Yann; Bernard, Guilhem; Martinez, Sergio; Grönqvist, Hanna; Baderot, Julien; Pinzan, Florian

2017-03-01

) and non-imaging techniques (SAXS). First approach is dedicated to high level fusion which is the art of combining various populations of results from homogeneous or heterogeneous tools, taking into account precision and repeatability of each of them to obtain a new more accurate result. The second approach is dedicated to deep level fusion which is the art of combining raw data from various tools in order to create a new raw data. We will introduce a new concept of virtual tool creator based on deep level fusion. As a conclusion we will discuss the implementation of hybrid metrology in semiconductor environment for advanced process control

Frequency and amplitude modulation of ultra-compact terahertz quantum cascade lasers using an integrated avalanche diode oscillator.

Science.gov (United States)

Castellano, Fabrizio; Li, Lianhe; Linfield, Edmund H; Davies, A Giles; Vitiello, Miriam S

2016-03-15

Mode-locked comb sources operating at optical frequencies underpin applications ranging from spectroscopy and ultrafast physics, through to absolute frequency measurements and atomic clocks. Extending their operation into the terahertz frequency range would greatly benefit from the availability of compact semiconductor-based sources. However, the development of any compact mode-locked THz laser, which itself is inherently a frequency comb, has yet to be achieved without the use of an external stimulus. High-power, electrically pumped quantum cascade lasers (QCLs) have recently emerged as a promising solution, owing to their octave spanning bandwidths, the ability to achieve group-velocity dispersion compensation and the possibility of obtaining active mode-locking. Here, we propose an unprecedented compact architecture to induce both frequency and amplitude self-modulation in a THz QCL. By engineering a microwave avalanche oscillator into the laser cavity, which provides a 10 GHz self-modulation of the bias current and output power, we demonstrate multimode laser emission centered around 3 THz, with distinct multiple sidebands. The resulting microwave amplitude and frequency self-modulation of THz QCLs opens up intriguing perspectives, for engineering integrated self-mode-locked THz lasers, with impact in fields such as nano- and ultrafast photonics and optical metrology.

Activities of the IPEN laboratory (CNEN/SP - Brazil) of nuclear metrology

International Nuclear Information System (INIS)

Dias, M.S.; Koskinas, M.F.; Pocobi, E.; Silva, C.A.M.; Machado, R.R.

1987-01-01

The determination of radionuclide activity for radioactive sources and standardized solutions is reported as the main purpose of the IPEN laboratory of nuclear metrology. The measurement systems installed in the laboratory, the measurable activity intervals and some of the standardized radionuclides (emphasizing the ones used in nuclear medicine) are presented. (M.A.C.) [pt

Characteristics of the radiation prevention metrology laboratory 'Cajavec' - Banjaluka

International Nuclear Information System (INIS)

Tomljenovic, I.; Ninkovic, M.; Kolonic, Dz.

2004-01-01

Radiation metrology laboratory built in the factory 'Cajavec' in Banja Luka, planed for gauge the detectors of ionization radiation. Laboratory as part of the large factory building , thus projected and formed according to positive radiation principles. Walls are constructed of basic concrete, main entrance of lead, approaching the radiation bench from the back side. Sound and light signal system connected with dosemeter for showing mini dose of radiation creating conditions for safe work of the dosemeterists. (author) [sr

Bayesian estimation methods in metrology

International Nuclear Information System (INIS)

Cox, M.G.; Forbes, A.B.; Harris, P.M.

2004-01-01

In metrology -- the science of measurement -- a measurement result must be accompanied by a statement of its associated uncertainty. The degree of validity of a measurement result is determined by the validity of the uncertainty statement. In recognition of the importance of uncertainty evaluation, the International Standardization Organization in 1995 published the Guide to the Expression of Uncertainty in Measurement and the Guide has been widely adopted. The validity of uncertainty statements is tested in interlaboratory comparisons in which an artefact is measured by a number of laboratories and their measurement results compared. Since the introduction of the Mutual Recognition Arrangement, key comparisons are being undertaken to determine the degree of equivalence of laboratories for particular measurement tasks. In this paper, we discuss the possible development of the Guide to reflect Bayesian approaches and the evaluation of key comparison data using Bayesian estimation methods

Metrological aspects of enzyme production

International Nuclear Information System (INIS)

Kerber, T M; Pereira-Meirelles, F V; Dellamora-Ortiz, G M

2010-01-01

Enzymes are frequently used in biotechnology to carry out specific biological reactions, either in industrial processes or for the production of bioproducts and drugs. Microbial lipases are an important group of biotechnologically valuable enzymes that present widely diversified applications. Lipase production by microorganisms is described in several published papers; however, none of them refer to metrological evaluation and the estimation of the uncertainty in measurement. Moreover, few of them refer to process optimization through experimental design. The objectives of this work were to enhance lipase production in shaken-flasks with Yarrowia lipolytica cells employing experimental design and to evaluate the uncertainty in measurement of lipase activity. The highest lipolytic activity obtained was about three- and fivefold higher than the reported activities of CRMs BCR-693 and BCR-694, respectively. Lipase production by Y. lipolytica cells aiming the classification as certified reference material is recommended after further purification and stability studies

Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory

International Nuclear Information System (INIS)

Advanced Light Source; Yashchuk, Valeriy V; Kirschman, Jonathan L.; Domning, Edward E.; McKinney, Wayne R.; Morrison, Gregory Y.; Smith, Brian V.; Yashchuk, Valeriy V.

2008-01-01

The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace Profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performance and characteristics of the upgraded LTP-II at the ALS Optical Metrology Laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms)slope variation

Metrological Traceability in the Social Sciences: A Model from Reading Measurement

International Nuclear Information System (INIS)

Stenner, A Jackson; Fisher, William P Jr

2013-01-01

The central importance of reading ability in learning makes it the natural place to start in formative and summative assessments in education. The Lexile Framework for Reading constitutes a commercial metrological traceability network linking books, test results, instructional materials, and students in elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia

Addressing FinFET metrology challenges in 1X node using tilt-beam CD-SEM

Science.gov (United States)

Zhang, Xiaoxiao; Zhou, Hua; Ge, Zhenhua; Vaid, Alok; Konduparthi, Deepasree; Osorio, Carmen; Ventola, Stefano; Meir, Roi; Shoval, Ori; Kris, Roman; Adan, Ofer; Bar-Zvi, Maayan

2014-04-01

At 1X node, 3D FinFETS raise a number of new metrology challenges. Gate height and fin height are two of the most important parameters for process control. At present there is a metrology gap in inline in-die measurement of these parameters. In order to fill this metrology gap, in-column beam tilt has been developed and implemented on Applied Materials V4i+ top-down CD-SEM for height measurement. A low tilt (5°) beam and a high tilt (14°) beam have been calibrated to obtain two sets of images providing measurement of sidewall edge width to calculate height in the host. Evaluations are done with applications in both gate height and fin height. TEM correlation with R2 being 0.89 and precision of 0.81nm have been achieved on various in-die features in gate height application. Fin height measurement shows less accuracy (R2 being 0.77) and precision (1.49 nm) due to challenges brought by fin geometry, yet still promising as first attempt. Sensitivity to DOE offset, die-to-die and in-die variation is demonstrated in both gate height and fin height. Process defect is successfully captured from inline wafers with gate height measurement implemented in production. This is the first successful demonstration of inline in-die gate height measurement for 14nm FinFET process control.

SUBTLEX-ESP: Spanish Word Frequencies Based on Film Subtitles

Science.gov (United States)

Cuetos, Fernando; Glez-Nosti, Maria; Barbon, Analia; Brysbaert, Marc

2011-01-01

Recent studies have shown that word frequency estimates obtained from films and television subtitles are better to predict performance in word recognition experiments than the traditional word frequency estimates based on books and newspapers. In this study, we present a subtitle-based word frequency list for Spanish, one of the most widely spoken…

Metrological and operational performance of measuring systems used in vehicle compressed natural gas filling stations

Energy Technology Data Exchange (ETDEWEB)

Velosa, Jhonn F.; Abril, Henry; Garcia, Luis E. [CDT de GAS (Venezuela). Gas Technological Development Center Corporation

2008-07-01

Corporation CDT GAS financially supported by the Colombian government through COLCIENCIAS, carried out a study aimed at designing, developing and implementing in Colombia a calibration and metrological verification 'specialized service' for gas meters installed at dispensers of filling stations using compressed natural gas. The results permitted the identification of improving opportunities (in measuring systems, equipment and devices used to deliver natural gas) which are focused on achieving the highest security and reliability of trading processes of CNG for vehicles. In the development of the first stage of the project, metrological type variables were initially considered, but given the importance of the measuring system and its interaction with the various elements involving gas supply to the filling station, the scope of the work done included aspects related to the operational performance, that is, those influencing the security of the users and the metrological performance of the measuring system. The development of the second stage counted on the collaboration of national companies from the sector of CNG for vehicles, which permitted the carrying out of multiple calibrations to the measuring systems installed in the CNG dispensers, thus achieving, in a concrete way, valid and reliable technological information of the implemented procedures. (author)

CONFERENCE NOTE: European Optical Society, Topical Meeting Optical Metrology and Nanotechnology, Engelberg, Switzerland, 27 30 March 1994

Science.gov (United States)

1993-01-01

This meeting, organized by the Paul Scherrer Institute's Department of Applied Solid State Physics, will be held from 27 30 March 1994 at the Hotel Regina-Titlis, Engelberg, Switzerland. The aim is to bring together scientists from two important fields of current research and increasing industrial relevance. Optical metrology is a traditional discipline of applied optics which reached the nanometre scale a long time ago. Nanotechnology is setting new limits and represents a major challenge to metrology, as well as offering new opportunities to optics. The meeting is intended to help define a common future for optical metrology and nanotechnology. Topics to be covered include: nanometre position control and measuring techniques ultrahigh precision interferometry scanning probe microscopy (AFM, SNOM, etc.) surface modification by scanning probe methods precision surface fabrication and characterization nanolithography micro-optics, diffractive optics components, including systems and applications subwavelength optical structures synthetic optical materials structures and technologies for X-ray optics. For further information please contact: Jens Gobrecht (Secretary), Paul Scherrer Institute, CH-5232 Villigen-PSI, Switzerland.Tel. (41)56992529; Fax (41) 5698 2635.

Holistic metrology qualification extension and its application to characterize overlay targets with asymmetric effects

Science.gov (United States)

Dos Santos Ferreira, Olavio; Sadat Gousheh, Reza; Visser, Bart; Lie, Kenrick; Teuwen, Rachel; Izikson, Pavel; Grzela, Grzegorz; Mokaberi, Babak; Zhou, Steve; Smith, Justin; Husain, Danish; Mandoy, Ram S.; Olvera, Raul

2018-03-01

Ever increasing need for tighter on-product overlay (OPO), as well as enhanced accuracy in overlay metrology and methodology, is driving semiconductor industry's technologists to innovate new approaches to OPO measurements. In case of High Volume Manufacturing (HVM) fabs, it is often critical to strive for both accuracy and robustness. Robustness, in particular, can be challenging in metrology since overlay targets can be impacted by proximity of other structures next to the overlay target (asymmetric effects), as well as symmetric stack changes such as photoresist height variations. Both symmetric and asymmetric contributors have impact on robustness. Furthermore, tweaking or optimizing wafer processing parameters for maximum yield may have an adverse effect on physical target integrity. As a result, measuring and monitoring physical changes or process abnormalities/artefacts in terms of new Key Performance Indicators (KPIs) is crucial for the end goal of minimizing true in-die overlay of the integrated circuits (ICs). IC manufacturing fabs often relied on CD-SEM in the past to capture true in-die overlay. Due to destructive and intrusive nature of CD-SEMs on certain materials, it's desirable to characterize asymmetry effects for overlay targets via inline KPIs utilizing YieldStar (YS) metrology tools. These KPIs can also be integrated as part of (μDBO) target evaluation and selection for final recipe flow. In this publication, the Holistic Metrology Qualification (HMQ) flow was extended to account for process induced (asymmetric) effects such as Grating Imbalance (GI) and Bottom Grating Asymmetry (BGA). Local GI typically contributes to the intrafield OPO whereas BGA typically impacts the interfield OPO, predominantly at the wafer edge. Stack height variations highly impact overlay metrology accuracy, in particular in case of multi-layer LithoEtch Litho-Etch (LELE) overlay control scheme. Introducing a GI impact on overlay (in nm) KPI check quantifies the

Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad

Energy Technology Data Exchange (ETDEWEB)

Alcock, Simon G., E-mail: simon.alcock@diamond.ac.uk; Nistea, Ioana; Sawhney, Kawal [Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire OX11 0DE (United Kingdom)

2016-05-15

We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM’s autocollimator adds into the overall measured value of the mirror’s slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad

International Nuclear Information System (INIS)

Alcock, Simon G.; Nistea, Ioana; Sawhney, Kawal

2016-01-01

We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM’s autocollimator adds into the overall measured value of the mirror’s slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad.

Science.gov (United States)

Alcock, Simon G; Nistea, Ioana; Sawhney, Kawal

2016-05-01

We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM's autocollimator adds into the overall measured value of the mirror's slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

In-die photomask registration and overlay metrology with PROVE using 2D correlation methods

Science.gov (United States)

Seidel, D.; Arnz, M.; Beyer, D.

2011-11-01

According to the ITRS roadmap, semiconductor industry drives the 193nm lithography to its limits, using techniques like double exposure, double patterning, mask-source optimization and inverse lithography. For photomask metrology this translates to full in-die measurement capability for registration and critical dimension together with challenging specifications for repeatability and accuracy. Especially, overlay becomes more and more critical and must be ensured on every die. For this, Carl Zeiss SMS has developed the next generation photomask registration and overlay metrology tool PROVE® which serves the 32nm node and below and which is already well established in the market. PROVE® features highly stable hardware components for the stage and environmental control. To ensure in-die measurement capability, sophisticated image analysis methods based on 2D correlations have been developed. In this paper we demonstrate the in-die capability of PROVE® and present corresponding measurement results for shortterm and long-term measurements as well as the attainable accuracy for feature sizes down to 85nm using different illumination modes and mask types. Standard measurement methods based on threshold criteria are compared with the new 2D correlation methods to demonstrate the performance gain of the latter. In addition, mask-to-mask overlay results of typical box-in-frame structures down to 200nm feature size are presented. It is shown, that from overlay measurements a reproducibility budget can be derived that takes into account stage, image analysis and global effects like mask loading and environmental control. The parts of the budget are quantified from measurement results to identify critical error contributions and to focus on the corresponding improvement strategies.

Laser metrology applied to the nuclear maintenance; Metrologia laser aplicada al mantenimiento nuclear

Energy Technology Data Exchange (ETDEWEB)

Garrido Garcia, J.; Sarti Fernandez, F.

2012-07-01

The development of this paper focuses on providing an overview of the state of the art about laser metrology. This type of equipment combines the measurement philosophy of laser scanning with the great precision of the robotic equipment of auscultation. Getting micron.

A Kalman-based Fundamental Frequency Estimation Algorithm

DEFF Research Database (Denmark)

Shi, Liming; Nielsen, Jesper Kjær; Jensen, Jesper Rindom

2017-01-01

Fundamental frequency estimation is an important task in speech and audio analysis. Harmonic model-based methods typically have superior estimation accuracy. However, such methods usually as- sume that the fundamental frequency and amplitudes are station- ary over a short time frame. In this pape...

A 3D edge detection technique for surface extraction in computed tomography for dimensional metrology applications

DEFF Research Database (Denmark)

Yagüe-Fabra, J.A.; Ontiveros, S.; Jiménez, R.

2013-01-01

Many factors influence the measurement uncertainty when using computed tomography for dimensional metrology applications. One of the most critical steps is the surface extraction phase. An incorrect determination of the surface may significantly increase the measurement uncertainty. This paper...... presents an edge detection method for the surface extraction based on a 3D Canny algorithm with sub-voxel resolution. The advantages of this method are shown in comparison with the most commonly used technique nowadays, i.e. the local threshold definition. Both methods are applied to reference standards...

Metrology for hydrogen energy applications: a project to address normative requirements

Science.gov (United States)

Haloua, Frédérique; Bacquart, Thomas; Arrhenius, Karine; Delobelle, Benoît; Ent, Hugo

2018-03-01

Hydrogen represents a clean and storable energy solution that could meet worldwide energy demands and reduce greenhouse gases emission. The joint research project (JRP) ‘Metrology for sustainable hydrogen energy applications’ addresses standardisation needs through pre- and co-normative metrology research in the fast emerging sector of hydrogen fuel that meet the requirements of the European Directive 2014/94/EU by supplementing the revision of two ISO standards that are currently too generic to enable a sustainable implementation of hydrogen. The hydrogen purity dispensed at refueling points should comply with the technical specifications of ISO 14687-2 for fuel cell electric vehicles. The rapid progress of fuel cell technology now requires revising this standard towards less constraining limits for the 13 gaseous impurities. In parallel, optimized validated analytical methods are proposed to reduce the number of analyses. The study aims also at developing and validating traceable methods to assess accurately the hydrogen mass absorbed and stored in metal hydride tanks; this is a research axis for the revision of the ISO 16111 standard to develop this safe storage technique for hydrogen. The probability of hydrogen impurity presence affecting fuel cells and analytical techniques for traceable measurements of hydrogen impurities will be assessed and new data of maximum concentrations of impurities based on degradation studies will be proposed. Novel validated methods for measuring the hydrogen mass absorbed in hydrides tanks AB, AB2 and AB5 types referenced to ISO 16111 will be determined, as the methods currently available do not provide accurate results. The outputs here will have a direct impact on the standardisation works for ISO 16111 and ISO 14687-2 revisions in the relevant working groups of ISO/TC 197 ‘Hydrogen technologies’.

Toward full-chip prediction of yield-limiting contact patterning failure: correlation of simulated image parameters to advanced contact metrology metrics

Science.gov (United States)

Sturtevant, John L.; Chou, Dyiann

2006-03-01

Electrical failure due to incomplete contacts or vias has arisen as one of the primary modes of yield loss for 130 nm and below designs in manufacturing. Such failures are generally understood to arise from both random and systematic sources. The addition of redundant vias, where possible, has long been an accepted DFM practice for mitigating the impact of random defects. Incomplete vias are often characterized by having a diameter near the target dimension but a depth of less than 100% of target. As such, it is a difficult problem to diagnose and debug in-line, since bright and dark field optical inspection systems cannot typically distinguish between a closed, partially open and fully open contact. Advanced metrology systems have emerged in recent years to meet this challenge, but no perfect manufacturing solution has yet been identified for full field verification of all contacts. Voltage Contrast (VC) SEM metrology biases the wafer to directly measure electrical conductivity after fill / polish, and can therefore easily discern a lack of electrical connection to the underlying conductor caused by incomplete photo, etch, or fill processing. While an entire wafer can in principal be VC scanned, throughput limitations dictate very sparse sampling in manufacturing. SEM profile grading (PG) leverages the rich content of the secondary electron waveform to decipher information about the bottom of the contact. Several authors have demonstrated an excellent response of the Profile Grade to intentional defocus vectors. However, the SEM can only target discreet or single digit groupings of contacts, and therefore requires intelligent guidance to identify those contacts which are most prone to failure, enabling protection of the fab WIP. An a-priori knowledge of which specific contacts in a layout are most likely to fail would prove very useful for proactive inspection in manufacturing. Model based pre-manufacturing verification allows for such knowledge to be communicated

Estudio sobre la metrología de la ceca romana de Augusta Emerita

Directory of Open Access Journals (Sweden)

Cebrián Sánchez, Miguel Ángel

2006-12-01

Full Text Available Metrology analysis of the Roman currency in Augusta Emerita has allowed to distinguish two different metrological patterns. The former is a Roman imperial; the latter is a Hispanic one, this being used until the end of the Augustan reign. From B.C. 2 on, and throughout the Tiberian reign, coinage is only carried out following the imperial pattern. This happens at a time of high coinage production in Augusta Emerita, which might probably explain the city’s urban development and embellishment heyday.Se estudia la metrología en la ceca romana –imperial y provincial- de Augusta Emerita. Dividimos el trabajo metrológico en dos grandes apartados, el primero analiza los pesos de las doce emisiones de la Mérida romana y el segundo pretende hacer una comparación con las otras cecas hispanas que, por su emisiones, están más próximas a las emeritenses. A esos dos apartados se añade una pequeña sección dedicada a la metalografía. A través de todo ello se demuestra que hubo dos sistemas metrológicos conviviendo, el republicano y el augústeo, emitiendose en Emerita y que el periodo de mayor auge de las emisiones incluye la etapa final del reinado de Augusto, post 2 a.C., y todo el reinado de Tiberio, lo que podría muy bien señalar el momento de apogeo y embellecimiento de la ciudad.

Advanced Metrology for Characterization of Magnetic Tunnel Junctions

DEFF Research Database (Denmark)

Kjær, Daniel

-plane tunneling (CIPT) for characterization of magnetic tunnel junctions (MTJs), which constitutes the key component not only in MRAM but also the read-heads of modern hard disk drives. MTJs are described by their tunnel magnetoresistance (TMR), which is the relative difference of the resistance area products (RA...... of this project has been to provide cheaper, faster and more precise metrology for MTJs. This goal has been achieved in part by the demonstration of a static field CIPT method, which allows us to reduce the measurement time by a factor of 5, by measuring only RA thus excluding TMR. This enhancement is obtained...

Industrial, agricultural, and medical applications of radiation metrology

International Nuclear Information System (INIS)

Hubbell, J.H.

1987-01-01

Photon and particle radiations (gamma rays, X-rays, bremsstrahlung, electrons and other charged particles, neutrons) from radioactive isotopes, X-ray tubes, and accelerators are now widely used in gauging, production control, and other monitoring and metrology devices where avoidance of mechanical contact is desirable. The general principles of radiation gauges, which rely on detection of radiation transmitted by the sample, or on detection of scattered or other secondary radiations produced in the sample, are discussed. Examples of such devices currently used in industrial, agricultural, and medical situations are presented, and some anticipated developments are mentioned. (author)

Triple-Frequency GPS Precise Point Positioning Ambiguity Resolution Using Dual-Frequency Based IGS Precise Clock Products

Directory of Open Access Journals (Sweden)

Fei Liu

2017-01-01

Full Text Available With the availability of the third civil signal in the Global Positioning System, triple-frequency Precise Point Positioning ambiguity resolution methods have drawn increasing attention due to significantly reduced convergence time. However, the corresponding triple-frequency based precise clock products are not widely available and adopted by applications. Currently, most precise products are generated based on ionosphere-free combination of dual-frequency L1/L2 signals, which however are not consistent with the triple-frequency ionosphere-free carrier-phase measurements, resulting in inaccurate positioning and unstable float ambiguities. In this study, a GPS triple-frequency PPP ambiguity resolution method is developed using the widely used dual-frequency based clock products. In this method, the interfrequency clock biases between the triple-frequency and dual-frequency ionosphere-free carrier-phase measurements are first estimated and then applied to triple-frequency ionosphere-free carrier-phase measurements to obtain stable float ambiguities. After this, the wide-lane L2/L5 and wide-lane L1/L2 integer property of ambiguities are recovered by estimating the satellite fractional cycle biases. A test using a sparse network is conducted to verify the effectiveness of the method. The results show that the ambiguity resolution can be achieved in minutes even tens of seconds and the positioning accuracy is in decimeter level.

Effect of a timebase mismatch in two-way optical frequency transfer

Science.gov (United States)

Tampellini, Anna; Clivati, Cecilia; Levi, Filippo; Mura, Alberto; Calonico, Davide

2017-12-01

Two-way frequency transfer on optical fibers is a powerful technique for the comparison of distant clocks over long and ultra-long hauls. In contrast to traditional Doppler noise cancellation, it is capable of sustaining higher link attenuation, mitigating the need of optical amplification and regeneration and thus reducing the setup complexity. We investigate the ultimate limitations of the two-way approach on a 300 km multiplexed fiber haul, considering fully independent setups and acquisition systems at the two link ends. We derive a theoretical model to predict the performance deterioration due to a bad synchronisation of the measurements, which is confirmed by experimental results. This study demonstrates that two-way optical frequency transfer is a reliable and performing technique, capable of sustaining remote clocks comparisons at the 10-19 resolution, and is relevant for the development of a fiber network of continental scale for frequency metrology in Europe.

Overcoming the Invisibility of Metrology: A Reading Measurement Network for Education and the Social Sciences

Science.gov (United States)

Fisher, William P., Jr.; Stenner, A. Jackson

2013-09-01

The public and researchers in psychology and the social sciences are largely unaware of the huge resources invested in metrology and standards in science and commerce, for understandable reasons, but with unfortunate consequences. Measurement quality varies widely in fields lacking uniform standards, making it impossible to coordinate local behaviours and decisions in tune with individually observed instrument readings. However, recent developments in reading measurement have effectively instituted metrological traceability methods within elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia. Given established patterns in the history of science, it may be reasonable to expect that widespread routine reproduction of controlled effects expressed in uniform units in the social sciences may lead to significant developments in theory and practice.

Overcoming the Invisibility of Metrology: A Reading Measurement Network for Education and the Social Sciences

International Nuclear Information System (INIS)

Fisher, William P Jr; Stenner, A Jackson

2013-01-01

The public and researchers in psychology and the social sciences are largely unaware of the huge resources invested in metrology and standards in science and commerce, for understandable reasons, but with unfortunate consequences. Measurement quality varies widely in fields lacking uniform standards, making it impossible to coordinate local behaviours and decisions in tune with individually observed instrument readings. However, recent developments in reading measurement have effectively instituted metrological traceability methods within elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia. Given established patterns in the history of science, it may be reasonable to expect that widespread routine reproduction of controlled effects expressed in uniform units in the social sciences may lead to significant developments in theory and practice

Proficiency testing in the light of a new rationale in metrology

DEFF Research Database (Denmark)

Heydorn, Kaj

2008-01-01

The novel proposed definition of measurement result in the international metrology vocabulary requires a revision of standards and guidelines for proficiency testing (PT), and a new approach to processing proficiency data is needed to test the ability of laboratories to present not only unbiased...... quantity values, but reliable estimates of their uncertainty. Hence, an accepted reference value with the smallest possible uncertainty is needed to ascertain the proficiency of laboratories reporting results with lower than average uncertainty. A strategy based on the T-statistic is proposed leading...... to an accepted reference value that fully reflects the uncertainties reported by participants in a PT scheme and permits calculation of En-numbers to distinguish whether or not measurement results are consistent with the accepted definition of the measurand. The strategy is applied to PT data from a recent...

Rydberg-atom based radio-frequency electrometry using frequency modulation spectroscopy in room temperature vapor cells.

Science.gov (United States)

Kumar, Santosh; Fan, Haoquan; Kübler, Harald; Jahangiri, Akbar J; Shaffer, James P

2017-04-17

Rydberg atom-based electrometry enables traceable electric field measurements with high sensitivity over a large frequency range, from gigahertz to terahertz. Such measurements are particularly useful for the calibration of radio frequency and terahertz devices, as well as other applications like near field imaging of electric fields. We utilize frequency modulated spectroscopy with active control of residual amplitude modulation to improve the signal to noise ratio of the optical readout of Rydberg atom-based radio frequency electrometry. Matched filtering of the signal is also implemented. Although we have reached similarly, high sensitivity with other read-out methods, frequency modulated spectroscopy is advantageous because it is well-suited for building a compact, portable sensor. In the current experiment, ∼3 µV cm-1 Hz-1/2 sensitivity is achieved and is found to be photon shot noise limited.

EU ITER TF coil: Dimensional metrology, a key player in the Double Pancake integration

International Nuclear Information System (INIS)

Poncet, L.; Bellesia, B.; Oliva, A. Bonito; Boter Rebollo, E.; Cornelis, M.; Cornella Medrano, J.; Harrison, R.; Bue, A. Lo; Moreno, A.; Foussat, A.; Felipe, A.; Echeandia, A.; Barutti, A.; Caserza, B.; Barbero, P.; Stenca, S.; Da Re, A.; Silva Ribeiro, J.; Brocot, C.; Benaoun, S.

2015-01-01

Highlights: • Development and qualification of a dimensional metrology procedure on wound superconductor trajectory based on Laser scanning system. • Dimensional control of the conductor centreline during winding, before and after heat treatment. • Radial Plate groove centreline length controlled using Laser Trackers. • Full scale wound Double Pancake prototype transferred inside Radial Plate prototype without any issues. - Abstract: The ITER Toroidal Field (TF) magnet system consists of 18 “D” shaped coils. Fusion for Energy (F4E), the European Domestic Agency for ITER, is responsible for the supply of 10 out the 19 TF coils (18 installed plus one spare coil). Each TF coil, about 300 t in weight, is made of a stainless steel case containing a Winding Pack (WP). The European manufacturing of the Radial Plates (RPs) and WPs has been awarded to two different industrial partners, whose activities are strongly linked with each other. In order to manufacture a Double Pancake (DP), first, the conductor has to be bent onto a D-shaped double spiral trajectory, then heat treated and inserted in the grooves of the RP. This represents the most challenging manufacturing step: in order to fit inside the groove, the double spiral trajectory of the conductor must match almost perfectly the trajectory of the groove, over a length above 700 m. In order to achieve this, the conductor trajectory length must be controlled with an accuracy of 1 mm over a length of 350 m while the radial plate groove has to be machined with tolerances of ±0.2 mm over dimensions of more than 10 m. In order to succeed, it has been essential to develop a metrology process capable to control with high accuracy both the DP conductor and the RP groove trajectories. This paper reports on the work carried out on the development and qualification of the dimensional metrology to monitor the manufacturing of the conductor. Reference is made to the final dimensional check of the RP focusing on the

Machine learning and predictive data analytics enabling metrology and process control in IC fabrication

Science.gov (United States)

Rana, Narender; Zhang, Yunlin; Wall, Donald; Dirahoui, Bachir; Bailey, Todd C.

2015-03-01

Integrate circuit (IC) technology is going through multiple changes in terms of patterning techniques (multiple patterning, EUV and DSA), device architectures (FinFET, nanowire, graphene) and patterning scale (few nanometers). These changes require tight controls on processes and measurements to achieve the required device performance, and challenge the metrology and process control in terms of capability and quality. Multivariate data with complex nonlinear trends and correlations generally cannot be described well by mathematical or parametric models but can be relatively easily learned by computing machines and used to predict or extrapolate. This paper introduces the predictive metrology approach which has been applied to three different applications. Machine learning and predictive analytics have been leveraged to accurately predict dimensions of EUV resist patterns down to 18 nm half pitch leveraging resist shrinkage patterns. These patterns could not be directly and accurately measured due to metrology tool limitations. Machine learning has also been applied to predict the electrical performance early in the process pipeline for deep trench capacitance and metal line resistance. As the wafer goes through various processes its associated cost multiplies. It may take days to weeks to get the electrical performance readout. Predicting the electrical performance early on can be very valuable in enabling timely actionable decision such as rework, scrap, feedforward, feedback predicted information or information derived from prediction to improve or monitor processes. This paper provides a general overview of machine learning and advanced analytics application in the advanced semiconductor development and manufacturing.

Metrology of variable-line-spacing x-ray gratings using the APS Long Trace Profiler

Science.gov (United States)

Sheung, Janet; Qian, Jun; Sullivan, Joseph; Thomasset, Muriel; Manton, Jonathan; Bean, Sunil; Takacs, Peter; Dvorak, Joseph; Assoufid, Lahsen

2017-09-01

As resolving power targets have increased with each generation of beamlines commissioned in synchrotron radiation facilities worldwide, diffraction gratings are quickly becoming crucial optical components for meeting performance targets. However, the metrology of variable-line-spacing (VLS) gratings for high resolution beamlines is not widespread; in particular, no metrology facility at any US DOE facility is currently equipped to fully characterize such gratings. To begin to address this issue, the Optics Group at the Advanced Photon Source at Argonne, in collaboration with SOLEIL and with support from Brookhaven National Laboratory (BNL), has developed an alternative beam path addition to the Long Trace Profiler (LTP) at Argonne's Advanced Photon Source. This significantly expands the functionality of the LTP not only to measure mirrors surface slope profile at normal incidence, but also to characterize the groove density of VLS diffraction gratings in the Littrow incidence up to 79°, which covers virtually all diffraction gratings used at synchrotrons in the first order. The LTP light source is a 20mW HeNe laser, which yields enough signal for diffraction measurements to be performed on low angle blazed gratings optimized for soft X-ray wavelengths. We will present the design of the beam path, technical requirements for the optomechanics, and our data analysis procedure. Finally, we discuss challenges still to be overcome and potential limitations with use of the LTP to perform metrology on diffraction gratings.

Contribution of the SLDC to the metrology of the ionizing radiations dosimetry in Mexico

International Nuclear Information System (INIS)

Alvarez R, J. T.

2010-01-01

The Secondary Laboratory of Dosimetric Calibration (SLDC), assigned to the Metrology Department of Ionizing Radiations of the ININ had its beginnings in the eighties, with the purpose of having a specialized area to develop and to establish measure patterns of the dosimetric magnitudes and units. In the year 2000 the National Center of Metrology of the country, delegated its functions to the SLDC, as regards to develop and to maintain the national patterns in the area of ionizing radiations. In this chapter a brief review is presented on the magnitudes and units used in dosimetry and and absorbed dose, as well as some of the activities of dosimetric calibration that have been made by part of the SLDC to the radiotherapy centers in Mexico and some applications to the nuclear power plant of Laguna Verde. (Author)

Low velocity target detection based on time-frequency image for high frequency ground wave radar

Institute of Scientific and Technical Information of China (English)

YAN Songhua; WU Shicai; WEN Biyang

2007-01-01

The Doppler spectral broadening resulted from non-stationary movement of target and radio-frequency interference will decrease the veracity of target detection by high frequency ground wave(HEGW)radar.By displaying the change of signal energy on two dimensional time-frequency images based on time-frequency analysis,a new mathematical morphology method to distinguish target from nonlinear time-frequency curves is presented.The analyzed results from the measured data verify that with this new method the target can be detected correctly from wide Doppler spectrum.

Gabor-domain optical coherence microscopy with integrated dual-axis MEMS scanner for fast 3D imaging and metrology

Science.gov (United States)

Canavesi, Cristina; Cogliati, Andrea; Hayes, Adam; Santhanam, Anand P.; Tankam, Patrice; Rolland, Jannick P.

2015-10-01

Fast, robust, nondestructive 3D imaging is needed for characterization of microscopic structures in industrial and clinical applications. A custom micro-electromechanical system (MEMS)-based 2D scanner system was developed to achieve 55 kHz A-scan acquisition in a Gabor-domain optical coherence microscopy (GD-OCM) instrument with a novel multilevel GPU architecture for high-speed imaging. GD-OCM yields high-definition volumetric imaging with dynamic depth of focusing through a bio-inspired liquid lens-based microscope design, which has no moving parts and is suitable for use in a manufacturing setting or in a medical environment. A dual-axis MEMS mirror was chosen to replace two single-axis galvanometer mirrors; as a result, the astigmatism caused by the mismatch between the optical pupil and the scanning location was eliminated and a 12x reduction in volume of the scanning system was achieved. Imaging at an invariant resolution of 2 μm was demonstrated throughout a volume of 1 × 1 × 0.6 mm3, acquired in less than 2 minutes. The MEMS-based scanner resulted in improved image quality, increased robustness and lighter weight of the system - all factors that are critical for on-field deployment. A custom integrated feedback system consisting of a laser diode and a position-sensing detector was developed to investigate the impact of the resonant frequency of the MEMS and the driving signal of the scanner on the movement of the mirror. Results on the metrology of manufactured materials and characterization of tissue samples with GD-OCM are presented.

Implementation of a metrology national network for radionuclides used in nuclear medicine

International Nuclear Information System (INIS)

Santos, J.A. dos; Lopes, R.T.; Iwahara, A.; Tauhata, L.; Nicoli, I.G.; Dias, C.M.

2003-01-01

The Brazilian Laboratory for Metrology of Ionizing Radiation (LNMRI), of the Radioprotection and Dosimetry Institute, owned by the National Commission of Nuclear Energy (IRD/CNEN-RJ) has conducting since 1998, a comparison program for measurements of radiopharmaceuticals activities applied to patients at Nuclear Medicine sector aiming to the assessment the quality of those measurements. In the Rio de Janeiro state this program is successfully performed existing however the necessity to implement such program all over the country. This problem is being solved through the implementation of a reference laboratories network at several points in the brazilian territory. For the establishment and good working of the network the following factors must be observed: the radionuclide calibrators at the reference laboratories must be connected to the LNMRI; the operators must be trained by the staff or the LNMRI, and the quality guarantee must be assured through a comparison program. Presently, the network point placed in Brasilia is running and covering all the center-west region. The results obtained at this region show that the implementation of the metrology network is viable, important and achievable

Dimensional Metrology of Non-rigid Parts Without Specialized Inspection Fixtures =

Science.gov (United States)

Sabri, Vahid

Quality control is an important factor for manufacturing companies looking to prosper in an era of globalization, market pressures and technological advances. Functionality and product quality cannot be guaranteed without this important aspect. Manufactured parts have deviations from their nominal (CAD) shape caused by the manufacturing process. Thus, geometric inspection is a very important element in the quality control of mechanical parts. We will focus here on the geometric inspection of non-rigid (flexible) parts which are widely used in the aeronautic and automotive industries. Non-rigid parts can have different forms in a free-state condition compared with their nominal models due to residual stress and gravity loads. To solve this problem, dedicated inspection fixtures are generally used in industry to compensate for the displacement of such parts for simulating the use state in order to perform geometric inspections. These fixtures and the installation and inspection processes are expensive and time-consuming. Our aim in this thesis is therefore to develop an inspection method which eliminates the need for specialized fixtures. This is done by acquiring a point cloud from the part in a free-state condition using a contactless measuring device such as optical scanning and comparing it with the CAD model for the deviation identification. Using a non-rigid registration method and finite element analysis, we numerically inspect the profile of a non-rigid part. To do so, a simulated displacement is performed using an improved definition of displacement boundary conditions for simulating unfixed parts. In addition, we propose a numerical method for dimensional metrology of non-rigid parts in a free-state condition based on the arc length measurement by calculating the geodesic distance using the Fast Marching Method (FMM). In this thesis, we apply our developed methods on industrial non-rigid parts with free-form surfaces simulated with different types of

Presentation of the Nuclear Material Metrology Laboratory (LAMMAN)

International Nuclear Information System (INIS)

Arpigny, S.; Biscarrat, C.; Ruas, A.; Viallesoubranne, C.; Hanssens, A.; Roche, C.

2008-01-01

The EQRAIN Uranium or Plutonium programmes (Evaluation of the Quality of Analysis Results in the Nuclear Industry) have led to the creation of round-robins, which require reference solutions of uranyl nitrate or of plutonium nitrate to be made available. The samples are fabricated and packaged, and their benchmark values determined, by the Nuclear Material Metrology Laboratory in the Atalante facility. All the operations are carried out by highly precise weighing, including correction for air buoyancy. In order to guarantee the preservation of reference samples, a laser-sealing apparatus is used to condition the final solutions in ampoules. Random tests to check the concentration of uranium or plutonium are carried out on a certain number of ampoules after the sealing step. The analysis are performed on a photo-gravimetric analysis line (in glove box for Pu) based on the titanium potentiometric analysis method. The ampoules are then packaged and delivered to the participating laboratories. The French nuclear laboratories participating in the EQRAIN programs belong to the Cea and to the AREVA Group, with activities covering the entire fuel cycle. They have been joined by new participants from European, Japanese and South American laboratories

Presentation of the Nuclear Material Metrology Laboratory (LAMMAN)

Energy Technology Data Exchange (ETDEWEB)

Arpigny, S.; Biscarrat, C.; Ruas, A.; Viallesoubranne, C. [CEA/DEN/DRCP/SE2A/LAMM, Marcoule, BP 17171, 30207 Bagnols sur Ceze (France); Hanssens, A.; Roche, C. [CEA/DEN/DRCP/CETAMA Marcoule, BP 17171, 30207 Bagnols sur Ceze (France)

2008-07-01

The EQRAIN Uranium or Plutonium programmes (Evaluation of the Quality of Analysis Results in the Nuclear Industry) have led to the creation of round-robins, which require reference solutions of uranyl nitrate or of plutonium nitrate to be made available. The samples are fabricated and packaged, and their benchmark values determined, by the Nuclear Material Metrology Laboratory in the Atalante facility. All the operations are carried out by highly precise weighing, including correction for air buoyancy. In order to guarantee the preservation of reference samples, a laser-sealing apparatus is used to condition the final solutions in ampoules. Random tests to check the concentration of uranium or plutonium are carried out on a certain number of ampoules after the sealing step. The analysis are performed on a photo-gravimetric analysis line (in glove box for Pu) based on the titanium potentiometric analysis method. The ampoules are then packaged and delivered to the participating laboratories. The French nuclear laboratories participating in the EQRAIN programs belong to the Cea and to the AREVA Group, with activities covering the entire fuel cycle. They have been joined by new participants from European, Japanese and South American laboratories.

Plant equipment services with laser metrology

International Nuclear Information System (INIS)

Hayes, J.H.; Kreitman, P.J.

1995-01-01

A new industrial metrology process is now being applied to support PWR Nuclear Plant Steam Generator Replacement Projects. The method uses laser tracking interferometry to perform as built surveys of existing and replacement plant equipment. This method provides precision data with a minimum of setup when compared to alternative methods available. In addition there is no post processing required to ascertain validity. The data is obtained quickly, processed in real time and displayed during the survey in the desired coordinate system. These capabilities make this method of industrial measure ideal for various data acquisition needs throughout the power industry, from internal/external equipment templating to area mapping. Laser tracking interferometry is an improvement on the present use of optical instruments and surveying technique. In order to describe the laser tracking interferometry measurement process, previous methods of templating and surveying are first reviewed

Relative Navigation for Satellite Formation Flying based on Radio Frequency Metrology

NARCIS (Netherlands)

Sun, R.

2014-01-01

To increase mission return, utilizing two or more spacecraft instead of one may sometimes be superior. This is especially true when a large spaceborne instrument needs to be created through larger and configurable baselines, such as telescopes and interferometers. However, coordinating the alignment

Development of a free software for laboratory of metrology

International Nuclear Information System (INIS)

Silveira, Renata R. da; Benevides, Clayton A.

2014-01-01

The Centro Regional de Ciencias Nucleares do Nordeste (CRCN-NE) has a Metrology Laboratory to realize radioactive assays and calibrations in X and gamma radiation. This job, realized before in a manual way, had only paper recording and a hard-working data recovery. The objective of this job was to develop an application with free software to manage the laboratory activities, as service recording, rastreability control and environmental conditions monitoring, beyond automate the certificates and reports. As result, we have obtained the optimization of the routine and the management of the laboratory. (author)

Deep sub-wavelength metrology for advanced defect classification

Science.gov (United States)

van der Walle, P.; Kramer, E.; van der Donck, J. C. J.; Mulckhuyse, W.; Nijsten, L.; Bernal Arango, F. A.; de Jong, A.; van Zeijl, E.; Spruit, H. E. T.; van den Berg, J. H.; Nanda, G.; van Langen-Suurling, A. K.; Alkemade, P. F. A.; Pereira, S. F.; Maas, D. J.

2017-06-01

Particle defects are important contributors to yield loss in semi-conductor manufacturing. Particles need to be detected and characterized in order to determine and eliminate their root cause. We have conceived a process flow for advanced defect classification (ADC) that distinguishes three consecutive steps; detection, review and classification. For defect detection, TNO has developed the Rapid Nano (RN3) particle scanner, which illuminates the sample from nine azimuth angles. The RN3 is capable of detecting 42 nm Latex Sphere Equivalent (LSE) particles on XXX-flat Silicon wafers. For each sample, the lower detection limit (LDL) can be verified by an analysis of the speckle signal, which originates from the surface roughness of the substrate. In detection-mode (RN3.1), the signal from all illumination angles is added. In review-mode (RN3.9), the signals from all nine arms are recorded individually and analyzed in order to retrieve additional information on the shape and size of deep sub-wavelength defects. This paper presents experimental and modelling results on the extraction of shape information from the RN3.9 multi-azimuth signal such as aspect ratio, skewness, and orientation of test defects. Both modeling and experimental work confirm that the RN3.9 signal contains detailed defect shape information. After review by RN3.9, defects are coarsely classified, yielding a purified Defect-of-Interest (DoI) list for further analysis on slower metrology tools, such as SEM, AFM or HIM, that provide more detailed review data and further classification. Purifying the DoI list via optical metrology with RN3.9 will make inspection time on slower review tools more efficient.

GUM2DFT—a software tool for uncertainty evaluation of transient signals in the frequency domain

International Nuclear Information System (INIS)

Eichstädt, S; Wilkens, V

2016-01-01

The Fourier transform and its counterpart for discrete time signals, the discrete Fourier transform (DFT), are common tools in measurement science and application. Although almost every scientific software package offers ready-to-use implementations of the DFT, the propagation of uncertainties in line with the guide to the expression of uncertainty in measurement (GUM) is typically neglected. This is of particular importance in dynamic metrology, when input estimation is carried out by deconvolution in the frequency domain. To this end, we present the new open-source software tool GUM2DFT, which utilizes closed formulas for the efficient propagation of uncertainties for the application of the DFT, inverse DFT and input estimation in the frequency domain. It handles different frequency domain representations, accounts for autocorrelation and takes advantage of the symmetry inherent in the DFT result for real-valued time domain signals. All tools are presented in terms of examples which form part of the software package. GUM2DFT will foster GUM-compliant evaluation of uncertainty in a DFT-based analysis and enable metrologists to include uncertainty evaluations in their routine work. (paper)

Neural Network Based Load Frequency Control for Restructuring ...

African Journals Online (AJOL)

Neural Network Based Load Frequency Control for Restructuring Power Industry. ... an artificial neural network (ANN) application of load frequency control (LFC) of a Multi-Area power system by using a neural network controller is presented.

Radionuclide metrology research for nuclear site decommissioning

Science.gov (United States)

Judge, S. M.; Regan, P. H.

2017-11-01

The safe and cost-effective decommissioning of legacy nuclear sites relies on accurate measurement of the radioactivity content of the waste materials, so that the waste can be assigned to the most appropriate disposal route. Such measurements are a new challenge for the science of radionuclide metrology which was established largely to support routine measurements on operating nuclear sites and other applications such as nuclear medicine. In this paper, we provide a brief summary of the international measurement system that is established to enable nuclear site operators to demonstrate that measurements are accurate, independent and fit for purpose, and highlight some of the projects that are underway to adapt the measurement system to meet the changing demands from the industry.

Ionising radiation metrology for the metallurgical industry

Directory of Open Access Journals (Sweden)

García-Toraño E.

2014-01-01

Full Text Available Every year millions tons of steel are produced worldwide from recycled scrap loads. Although the detection systems in the steelworks prevent most orphan radioactive sources from entering the furnace, there is still the possibility of accidentally melting a radioactive source. The MetroMetal project, carried out in the frame of the European Metrology Research Programme (EMRP, addresses this problem by studying the existing measurement systems, developing sets of reference sources in various matrices (cast steel, slag, fume dust and proposing new detection instruments. This paper presents the key lines of the project and describes the preparation of radioactive sources as well as the intercomparison exercises used to test the calibration and correction methods proposed within the project.

Accreditation experience of radioisotope metrology laboratory of Argentina

Energy Technology Data Exchange (ETDEWEB)

Iglicki, A. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina)]. E-mail: iglicki@cae.cnea.gov.ar; Mila, M.I. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina)]. E-mail: mila@cae.cnea.gov.ar; Furnari, J.C. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina); Arenillas, P. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina); Cerutti, G. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina); Carballido, M. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina); Guillen, V. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina); Araya, X. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina); Bianchini, R. [Laboratorio de Metrologia de Radioisotopos, Comision Nacional de Energia Atomica (Argentina)

2006-10-15

This work presents the experience developed by the Radioisotope Metrology Laboratory (LMR), of the Argentine National Atomic Energy Commission (CNEA), as result of the accreditation process of the Quality System by ISO 17025 Standard. Considering the LMR as a calibration laboratory, services of secondary activity determinations and calibration of activimeters used in Nuclear Medicine were accredited. A peer review of the ({alpha}/{beta})-{gamma} coincidence system was also carried out. This work shows in detail the structure of the quality system, the results of the accrediting audit and gives the number of non-conformities detected and of observations made which have all been resolved.

Accreditation experience of radioisotope metrology laboratory of Argentina

International Nuclear Information System (INIS)

Iglicki, A.; Mila, M.I.; Furnari, J.C.; Arenillas, P.; Cerutti, G.; Carballido, M.; Guillen, V.; Araya, X.; Bianchini, R.

2006-01-01

This work presents the experience developed by the Radioisotope Metrology Laboratory (LMR), of the Argentine National Atomic Energy Commission (CNEA), as result of the accreditation process of the Quality System by ISO 17025 Standard. Considering the LMR as a calibration laboratory, services of secondary activity determinations and calibration of activimeters used in Nuclear Medicine were accredited. A peer review of the (α/β)-γ coincidence system was also carried out. This work shows in detail the structure of the quality system, the results of the accrediting audit and gives the number of non-conformities detected and of observations made which have all been resolved

LISA Pathfinder: Optical Metrology System monitoring during operations

Science.gov (United States)

Audley, Heather E.; LISA Pathfinder Collaboration

2017-05-01

The LISA Pathfinder (LPF) mission has demonstrated excellent performance. In addition to having surpassed the main mission goals, data has been collected from the various subsystems throughout the duration of the mission. This data is a valuable resource, both for a more complete understanding of the LPF satellite and the differential acceleration measurements, as well as for the design of the future Laser Interferometer Space Antenna (LISA) mission. Initial analysis of the Optical Metrology System (OMS) data was performed as part of daily system monitoring, and more in-depth analyses are ongoing. This contribution presents an overview of these activities along with an introduction to the OMS.

Bayesian statistics in radionuclide metrology: measurement of a decaying source

International Nuclear Information System (INIS)

Bochud, F. O.; Bailat, C.J.; Laedermann, J.P.

2007-01-01

The most intuitive way of defining a probability is perhaps through the frequency at which it appears when a large number of trials are realized in identical conditions. The probability derived from the obtained histogram characterizes the so-called frequentist or conventional statistical approach. In this sense, probability is defined as a physical property of the observed system. By contrast, in Bayesian statistics, a probability is not a physical property or a directly observable quantity, but a degree of belief or an element of inference. The goal of this paper is to show how Bayesian statistics can be used in radionuclide metrology and what its advantages and disadvantages are compared with conventional statistics. This is performed through the example of an yttrium-90 source typically encountered in environmental surveillance measurement. Because of the very low activity of this kind of source and the small half-life of the radionuclide, this measurement takes several days, during which the source decays significantly. Several methods are proposed to compute simultaneously the number of unstable nuclei at a given reference time, the decay constant and the background. Asymptotically, all approaches give the same result. However, Bayesian statistics produces coherent estimates and confidence intervals in a much smaller number of measurements. Apart from the conceptual understanding of statistics, the main difficulty that could deter radionuclide metrologists from using Bayesian statistics is the complexity of the computation. (authors)

High-frequency applications of high-temperature superconductor thin films

Science.gov (United States)

Klein, N.

2002-10-01

High-temperature superconducting thin films offer unique properties which can be utilized for a variety of high-frequency device applications in many areas related to the strongly progressing market of information technology. One important property is an exceptionally low level of microwave absorption at temperatures attainable with low power cryocoolers. This unique property has initiated the development of various novel type of microwave devices and commercialized subsystems with special emphasis on application in advanced microwave communication systems. The second important achievement related to efforts in oxide thin and multilayer technology was the reproducible fabrication of low-noise Josephson junctions in high-temperature superconducting thin films. As a consequence of this achievement, several novel nonlinear high-frequency devices, most of them exploiting the unique features of the ac Josephson effect, have been developed and found to exhibit challenging properties to be utilized in basic metrology and Terahertz technology. On the longer timescale, the achievements in integrated high-temperature superconductor circuit technology may offer a strong potential for the development of digital devices with possible clock frequencies in the range of 100 GHz.

High-frequency applications of high-temperature superconductor thin films

International Nuclear Information System (INIS)

Klein, N.

2002-01-01

High-temperature superconducting thin films offer unique properties which can be utilized for a variety of high-frequency device applications in many areas related to the strongly progressing market of information technology. One important property is an exceptionally low level of microwave absorption at temperatures attainable with low power cryocoolers. This unique property has initiated the development of various novel type of microwave devices and commercialized subsystems with special emphasis on application in advanced microwave communication systems. The second important achievement related to efforts in oxide thin and multilayer technology was the reproducible fabrication of low-noise Josephson junctions in high-temperature superconducting thin films. As a consequence of this achievement, several novel nonlinear high-frequency devices, most of them exploiting the unique features of the ac Josephson effect, have been developed and found to exhibit challenging properties to be utilized in basic metrology and Terahertz technology. On the longer timescale, the achievements in integrated high-temperature superconductor circuit technology may offer a strong potential for the development of digital devices with possible clock frequencies in the range of 100 GHz. (author)

Frequency-tunable SRF cavities for microwave opto-mechanics

Science.gov (United States)

Castelli, Alessandro; Martinez, Luis; Pate, Jacob; Thompson, Johnathon; Chiao, Raymond; Sharping, Jay

Three dimensional SRF (Superconducting Radio Frequency) cavities are known for achieving high quality factors (Q =109 or higher) but suffer from limited frequency tunability once fabricated and cooled to superconducting temperatures. Our end-wall design allows for numerous applications of cavity tuning at temperatures as low as 40 millikelvin. Using a bimorphic piezoelectric transducer, we demonstrate approximately 15 MHz of resonance tunability for the TE011 mode at cryogenic temperatures in a cylindrical reactor grade niobium (Nb) cavity (10% of the range at room temperature). This range doubles when using tunable end-walls on both cavity ends. We report on techniques for improving the Q of multi-component cavities including the use of concave end-walls to reduce fields near the cylinder ends and indium O-rings to reduce resistive losses at the gaps. Three-dimensional SRF cavities of this type have potential applications to quantum information science, precision displacement metrology, and quantum electro-dynamics.

Un proyecto europeo en metrología de altas temperaturas para aplicaciones industriales

Directory of Open Access Journals (Sweden)

del Campo, D.

2013-08-01

Full Text Available The measurement of temperatures above 1000 ºC is both difficult and yet vital for the success of a wide range of industrial processes; glass and ceramic manufacturing (1100 ºC to 2000 ºC or refractory metals production (2500+ ºC are clear examples. Many of these industries require improved process efficiency/control, because of growing environmental concerns (emissions/”zero waste” and competition from outside the EU. One of the keys to making advances to these drivers is improving process control by improved high temperature measurement. In the frame of the European Metrology Research Program (EMRP, a project named “High temperature metrology for industrial applications (HiTeMS with the overall objective of developing a suite of methods and techniques for improving the measurement of high temperatures in industry has been running since September 2011. This paper gives an overview of the main objectives of the project and the technical activities that are being performed.La medida de temperatura por encima de 1000 ºC es tanto complicada como vital para el éxito de una gran variedad de procesos industriales; la producción de cerámica y vidrio (de 1100 ºC a 2000 ºC o de materiales refractarios (temperaturas por encima de 2500 ºC, son claros ejemplos. Muchas de estas industrias requieren una mejora de la eficiencia y del control de sus procesos debido a la creciente preocupación por el medio ambiente (“cero emisiones” y la competencia de países fuera de la Unión Europea. Una de las claves para llevar a cabo avances en este sentido es mediante la mejora del control de los procesos mejorando la medida de alta temperatura. Dentro del Programa Europeo de Investigación en Metrología (EMRP en sus siglas en inglés se está desarrollando, desde septiembre de 2011, un proyecto llamado “Metrología de altas temperaturas para aplicaciones industriales” (HiTeMs, con el objetivo fundamental de desarrollar una serie de m

Establishment of a computer-controlled retroreflection measurement system at the National Metrology Institute of Turkey (UME)

International Nuclear Information System (INIS)

Samedov, Farhad; Celikel, Oguz; Bazkir, Ozcan

2005-01-01

In order to characterize photometric properties of retroreflectors, a fully automated retroreflector measurement system is designed in National Metrology Institute of Turkey (UME). The system is composed of a lighting projector, a goniometer, filter radiometers, 100 dB transimpedance amplifiers, and 24-bit resolution analog-digital converter card with a special software. The established system provides a new calibration capability to determine the luminous intensity and retroreflection coefficients of the retroreflective materials with the expanded uncertainties of 1.07% and 1.13% (k=2), respectively. The traceability in retroreflection measurements was linked to the detector-based photometric scale of UME

Complex metrology on 3D structures using multi-channel OCD

Science.gov (United States)

Kagalwala, Taher; Mahendrakar, Sridhar; Vaid, Alok; Isbester, Paul K.; Cepler, Aron; Kang, Charles; Yellai, Naren; Sendelbach, Matthew; Ko, Mihael; Ilgayev, Ovadia; Katz, Yinon; Tamam, Lilach; Osherov, Ilya

2017-03-01

Device scaling has not only driven the use of measurements on more complex structures, in terms of geometry, materials, and tighter ground rules, but also the need to move away from non-patterned measurement sites to patterned ones. This is especially of concern for very thin film layers that have a high thickness dependence on structure geometry or wafer pattern factor. Although 2-dimensional (2D) sites are often found to be sufficient for process monitoring and control of very thin films, sometimes 3D sites are required to further simulate structures within the device. The measurement of film thicknesses only a few atoms thick on complex 3D sites, however, are very challenging. Apart from measuring thin films on 3D sites, there is also a critical need to measure parameters on 3D sites, which are weak and less sensitive for OCD (Optical Critical Dimension) metrology, with high accuracy and precision. Thus, state-ofthe-art methods are needed to address such metrology challenges. This work introduces the concept of Enhanced OCD which uses various methods to improve the sensitivity and reduce correlations for weak parameters in a complex measurement. This work also describes how more channels of information, when used correctly, can improve the precision and accuracy of weak, non-sensitive or complex parameters of interest.

A new frequency matching technique for FRF-based model updating

Science.gov (United States)

Yang, Xiuming; Guo, Xinglin; Ouyang, Huajiang; Li, Dongsheng

2017-05-01

Frequency Response Function (FRF) residues have been widely used to update Finite Element models. They are a kind of original measurement information and have the advantages of rich data and no extraction errors, etc. However, like other sensitivity-based methods, an FRF-based identification method also needs to face the ill-conditioning problem which is even more serious since the sensitivity of the FRF in the vicinity of a resonance is much greater than elsewhere. Furthermore, for a given frequency measurement, directly using a theoretical FRF at a frequency may lead to a huge difference between the theoretical FRF and the corresponding experimental FRF which finally results in larger effects of measurement errors and damping. Hence in the solution process, correct selection of the appropriate frequency to get the theoretical FRF in every iteration in the sensitivity-based approach is an effective way to improve the robustness of an FRF-based algorithm. A primary tool for right frequency selection based on the correlation of FRFs is the Frequency Domain Assurance Criterion. This paper presents a new frequency selection method which directly finds the frequency that minimizes the difference of the order of magnitude between the theoretical and experimental FRFs. A simulated truss structure is used to compare the performance of different frequency selection methods. For the sake of reality, it is assumed that not all the degrees of freedom (DoFs) are available for measurement. The minimum number of DoFs required in each approach to correctly update the analytical model is regarded as the right identification standard.

Traceable size determination of nanoparticles, a comparison among European metrology institutes

International Nuclear Information System (INIS)

Meli, Felix; Klein, Tobias; Buhr, Egbert; Frase, Carl Georg; Gleber, Gudrun; Krumrey, Michael; Duta, Alexandru; Duta, Steluta; Korpelainen, Virpi; Bellotti, Roberto; Picotto, Gian Bartolo; Boyd, Robert D; Cuenat, Alexandre

2012-01-01

Within the European iMERA-Plus project ‘Traceable Characterisation of Nanoparticles’ various particle measurement procedures were developed and finally a measurement comparison for particle size was carried out among seven laboratories across six national metrology institutes. Seven high quality particle samples made from three different materials and having nominal sizes in the range from 10 to 200 nm were used. The participants applied five fundamentally different measurement methods, atomic force microscopy, dynamic light scattering (DLS), small-angle x-ray scattering, scanning electron microscopy and scanning electron microscopy in transmission mode, and provided a total of 48 independent, traceable results. The comparison reference values were determined as weighted means based on the estimated measurement uncertainties of the participants. The comparison reference values have combined standard uncertainties smaller than 1.4 nm for particles with sizes up to 100 nm. All methods, except DLS, provided consistent results. (paper)

Towards the Realization of Graphene Based Flexible Radio Frequency Receiver

Directory of Open Access Journals (Sweden)

Maruthi N. Yogeesh

2015-11-01

Full Text Available We report on our progress and development of high speed flexible graphene field effect transistors (GFETs with high electron and hole mobilities (~3000 cm2/V·s, and intrinsic transit frequency in the microwave GHz regime. We also describe the design and fabrication of flexible graphene based radio frequency system. This RF communication system consists of graphite patch antenna at 2.4 GHz, graphene based frequency translation block (frequency doubler and AM demodulator and graphene speaker. The communication blocks are utilized to demonstrate graphene based amplitude modulated (AM radio receiver operating at 2.4 GHz.

Looking at the future of manufacturing metrology: roadmap document of the German VDI/VDE Society for Measurement and Automatic Control

OpenAIRE

Berthold, J.; Imkamp, D.

2013-01-01

"Faster, safer, more accurately and more flexibly'' is the title of the "manufacturing metrology roadmap'' issued by the VDI/VDE Society for Measurement and Automatic Control (http://www.vdi.de/gma). The document presents a view of the development of metrology for industrial production over the next ten years and was drawn up by a German group of experts from research and industry. The following paper summarizes the content of the roadmap and explains the individual concepts of "Faster, safer...

Metrology and Proportion in the Ecclesiastical Architecture of Medieval Ireland

OpenAIRE

Behan, Avril; Moss, Rachel

2008-01-01

The aim of this paper is to examine the extent to which detailed empirical analysis of the metrology and proportional systems used in the design of Irish ecclesiastical architecture can be analysed to provide historical information not otherwise available. Focussing on a relatively limited sample of window tracery designs as a case study, it will first set out to establish what, if any, systems were in use, and then what light these might shed on the background, training and work practices of...

On the evaluation of photogrammetric methods for dense 3D surface reconstruction in a metrological context

Science.gov (United States)

Toschi, I.; Capra, A.; De Luca, L.; Beraldin, J.-A.; Cournoyer, L.

2014-05-01

This paper discusses a methodology to evaluate the accuracy of recently developed image-based 3D modelling techniques. So far, the emergence of these novel methods has not been supported by the definition of an internationally recognized standard which is fundamental for user confidence and market growth. In order to provide an element of reflection and solution to the different communities involved in 3D imaging, a promising approach is presented in this paper for the assessment of both metric quality and limitations of an open-source suite of tools (Apero/MicMac), developed for the extraction of dense 3D point clouds from a set of unordered 2D images. The proposed procedural workflow is performed within a metrological context, through inter-comparisons with "reference" data acquired with two hemispherical laser scanners, one total station, and one laser tracker. The methodology is applied to two case studies, designed in order to analyse the software performances in dealing with both outdoor and environmentally controlled conditions, i.e. the main entrance of Cathédrale de la Major (Marseille, France) and a custom-made scene located at National Research Council of Canada 3D imaging Metrology Laboratory (Ottawa). Comparative data and accuracy evidence produced for both tests allow the study of some key factors affecting 3D model accuracy.

CDF central detector installation. An efficient merge of digital photogrammetry and laser tracker metrology

International Nuclear Information System (INIS)

Greenwood, John A.; Wojcik, George J.

2003-01-01

Metrology for Run II at the Collider Detector at Fermilab (CDF) required a very complex geodetic survey. The Collision Hall network, surveyed with a Laser Tracker and digital level, provides a constraining network for the positioning of the Central Detector (CD). A part-based Laser Tracker network, which surrounded the 2,000-ton CD, was used as control for assembly. Subassembly surveys of the Detector's major components were measured as independent networks using Laser Tracker, V-STARS/S (Video-Simultaneous Triangulation And Resection System/Single camera) digital photogrammetry system, and BETS (Brunson Electronic Theodolite System) theodolite triangulation system. Each subassembly survey was transformed into and constrained by the part-based network. For roll-in, the CD part-based network was transformed into the Collision Hall network coordinate system. The CD was positioned in the Collision Hall using two Laser Trackers in 'stakeout mode.' This paper discusses the survey, adjustment, transformation, and precision of the various networks. (author)

On frequency-weighted coprime factorization based controller reduction

OpenAIRE

Varga, Andras

2003-01-01

We consider the efficient solution of a class of coprime factorization based controller approximation problems by using frequency-weighted balancing related model reduction approaches. It is shown that for some special stability enforcing frequency-weights, the computation of the frequency-weighted controllability and observability grammians can be done by solving reduced order Lyapunov equations. The new approach can be used in conjunction with accuracy enhancing square-root and balancing-fr...

A metrology system for a high resolution cavity beam position monitor system

Science.gov (United States)

Walston, Sean; Boogert, Stewart; Chung, Carl; Fitsos, Pete; Frisch, Joe; Gronberg, Jeff; Hayano, Hitoshi; Hinton, Shantell; Honda, Yosuke; Khainovski, Oleg; Kolomensky, Yury; Loscutoff, Peter; Lyapin, Alexey; Malton, Stephen; May, Justin; McCormick, Douglas; Meller, Robert; Miller, David; Orimoto, Toyoko; Ross, Marc; Slater, Mark; Smith, Steve; Smith, Tonee; Terunuma, Nobuhiro; Thomson, Mark; Urakawa, Junji; Vogel, Vladimir; Ward, David; White, Glen

2013-11-01

International Linear Collider (ILC) interaction region beam sizes and component position stability requirements will likely be as small as a few nanometers. It is important to the ILC design effort to demonstrate that these tolerances can be achieved-ideally using a beam-based stability measurement. We developed a high resolution RF cavity Beam Position Monitor (BPM) system. A triplet of these BPMs, installed in the extraction line of the KEK Accelerator Test Facility (ATF) and tested with its ultra-low emittance beam, achieved a position measurement resolution of 15 nm. A metrology system for the three BPMs was subsequently installed. This system employed optical encoders to measure each BPM's position and orientation relative to a zero-coefficient of thermal expansion carbon fiber frame. We have demonstrated that the three BPMs behave as a rigid-body at the level of less than 5 nm.

Frequency of Testing for Dyslipidemia: An Evidence-Based Analysis

Science.gov (United States)

2014-01-01

Background Dyslipidemias include high levels of total cholesterol, low-density lipoprotein (LDL) cholesterol, and triglycerides and low levels of high-density lipoprotein (HDL) cholesterol. Dyslipidemia is a risk factor for cardiovascular disease, which is a major contributor to mortality in Canada. Approximately 23% of the 2009/11 Canadian Health Measures Survey (CHMS) participants had a high level of LDL cholesterol, with prevalence increasing with age, and approximately 15% had a total cholesterol to HDL ratio above the threshold. Objectives To evaluate the frequency of lipid testing in adults not diagnosed with dyslipidemia and in adults on treatment for dyslipidemia. Research Methods A systematic review of the literature set out to identify randomized controlled trials (RCTs), systematic reviews, health technology assessments (HTAs), and observational studies published between January 1, 2000, and November 29, 2012, that evaluated the frequency of testing for dyslipidemia in the 2 populations. Results Two observational studies assessed the frequency of lipid testing, 1 in individuals not on lipid-lowering medications and 1 in treated individuals. Both studies were based on previously collected data intended for a different objective and, therefore, no conclusions could be reached about the frequency of testing at intervals other than the ones used in the original studies. Given this limitation and generalizability issues, the quality of evidence was considered very low. No evidence for the frequency of lipid testing was identified in the 2 HTAs included. Canadian and international guidelines recommend testing for dyslipidemia in individuals at an increased risk for cardiovascular disease. The frequency of testing recommended is based on expert consensus. Conclusions Conclusions on the frequency of lipid testing could not be made based on the 2 observational studies. Current guidelines recommend lipid testing in adults with increased cardiovascular risk, with

A focal plane metrology system and PSF centroiding experiment

Science.gov (United States)

Li, Haitao; Li, Baoquan; Cao, Yang; Li, Ligang

2016-10-01

In this paper, we present an overview of a detector array equipment metrology testbed and a micro-pixel centroiding experiment currently under development at the National Space Science Center, Chinese Academy of Sciences. We discuss on-going development efforts aimed at calibrating the intra-/inter-pixel quantum efficiency and pixel positions for scientific grade CMOS detector, and review significant progress in achieving higher precision differential centroiding for pseudo star images in large area back-illuminated CMOS detector. Without calibration of pixel positions and intrapixel response, we have demonstrated that the standard deviation of differential centroiding is below 2.0e-3 pixels.

Bell Inequality, Einstein-Podolsky-Rosen Steering, and Quantum Metrology with Spinor Bose-Einstein Condensates