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Sample records for euv spectrophotometer esp

  1. The EUV spectrophotometer on Atmosphere Explorer.

    Science.gov (United States)

    Hinteregger, H. E.; Bedo, D. E.; Manson, J. E.

    1973-01-01

    An extreme ultraviolet (EUV) spectrophotometer for measurements of solar radiation at wavelengths ranging from 140 to 1850 A will be included in the payload of each of the three Atmosphere-Explorer (AE) missions, AE-C, -D, and -E. The instrument consists of 24 grating monochromators, 12 of which can be telecommanded either to execute 128-step scans each covering a relatively small section of the total spectrophotometer wavelength range or to maintain fixed (command-selected) wavelength positions. The remaining 12 nonscan monochromators operate at permanently fixed wavelengths and view only a small fraction of the solar disk except for one viewing the whole sun in H Lyman alpha. Ten of the 12 scan-capable monochromators also view the entire solar disk since their primary function is to measure the total fluxes independent of the distribution of sources across the solar disk.

  2. Normal incidence spectrophotometer using high density transmission grating technology and highly efficiency silicon photodiodes for absolute solar EUV irradiance measurements

    Science.gov (United States)

    Ogawa, H. S.; Mcmullin, D.; Judge, D. L.; Korde, R.

    1992-01-01

    New developments in transmission grating and photodiode technology now make it possible to realize spectrometers in the extreme ultraviolet (EUV) spectral region (wavelengths less than 1000 A) which are expected to be virtually constant in their diffraction and detector properties. Time dependent effects associated with reflection gratings are eliminated through the use of free standing transmission gratings. These gratings together with recently developed and highly stable EUV photodiodes have been utilized to construct a highly stable normal incidence spectrophotometer to monitor the variability and absolute intensity of the solar 304 A line. Owing to its low weight and compactness, such a spectrometer will be a valuable tool for providing absolute solar irradiance throughout the EUV. This novel instrument will also be useful for cross-calibrating other EUV flight instruments and will be flown on a series of Hitchhiker Shuttle Flights and on SOHO. A preliminary version of this instrument has been fabricated and characterized, and the results are described.

  3. Variations in EUV Irradiance: Comparison between LYRA, ESP, and SWAP Integrated Flux

    Directory of Open Access Journals (Sweden)

    Mehmet Sarp Yalim

    2014-01-01

    Full Text Available The Sun Watcher Using Active Pixel System Detector and Image Processing (SWAP telescope and Large Yield Radiometer (LYRA are the two Sun observation instruments on-board PROBA2. SWAP extreme ultraviolet images, if presented in terms of the integrated flux over solar disk, in general, correlate well with LYRA channel 2–4 (zirconium filter and channels QD and 18 of EVE/ESP on-board SDO between 2010 and 2013. Hence, SWAP can be considered as an additional radiometric channel. We compare in detail LYRA channel 2–4 and SWAP integrated flux in July 2010 and in particular during the solar eclipse that occurred on July 11, 2010. During this eclipse, the discrepancy between the two data channels can be explained to be related to the occultation of active region 11087 by the Moon. In the second half of July 2010, LYRA channel 2–4 and SWAP integrated flux deviate from each other, but these differences can also be explained in terms of features appearing on the solar disk such as coronal holes and active regions. By additionally comparing with timeline of EVE/ESP, we can preliminarily interpret these differences in terms of the difference between the broad bandpass of LYRA channel 2–4 and the, relatively speaking, narrower bandpass of SWAP.

  4. SDO-EVE multiple EUV grating spectrograph (MEGS) optical design

    Science.gov (United States)

    Crotser, David A.; Woods, Thomas N.; Eparvier, Francis G.; Ucker, Greg; Kohnert, Richard A.; Berthiaume, Gregory D.; Weitz, David M.

    2004-10-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in 2008, incorporates a suite of instruments including the EUV Variability Experiment (EVE). The EVE instrument package contains grating spectrographs used to measure the solar extreme ultraviolet (EUV) irradiance from 0.1 to 105 nm. The Multiple EUV Grating Spectrograph (MEGS) channels use concave reflection gratings to image solar spectra onto CCDs that are operated at -100°C. MEGS provides 0.1nm spectral resolution between 5-105nm every 10 seconds with an absolute accuracy of better than 25% over the SDO 5-year mission. MEGS-A utilizes a unique grazing-incidence, off-Rowland circle (RC) design to minimize angle of incidence at the detector while meeting high resolution requirements. MEGS-B utilizes a double-pass, cross-dispersed double-Rowland circle design. MEGS-P, a Ly-α monitor, will provide a proxy model calibration in the 60-105 nm range. Finally, the Solar Aspect Monitor (SAM) channel will provide continual pointing information for EVE as well as low-resolution X-ray images of the sun. In-flight calibrations for MEGS will be provided by the on-board EUV Spectrophotometer (ESP) in the 0.1-7nm and 17-37nm ranges, as well as from annual under-flight rocket experiments. We present the methodology used to develop the MEGS optical design.

  5. Dobson ozone spectrophotometer modification.

    Science.gov (United States)

    Komhyr, W. D.; Grass, R. D.

    1972-01-01

    Description of a modified version of the Dobson ozone spectrophotometer in which several outdated electronic design features have been replaced by circuitry embodying more modern design concepts. The resulting improvement in performance characteristics has been obtained without changing the principle of operation of the original instrument.

  6. Prediction of Extreme Ultraviolet Variability Experiment (EVE)/ Extreme Ultraviolet Spectro-Photometer (ESP) Irradiance from Solar Dynamics Observatory (SDO)/ Atmospheric Imaging Assembly (AIA) Images Using Fuzzy Image Processing and Machine Learning

    Science.gov (United States)

    Colak, T.; Qahwaji, R.

    2013-03-01

    The cadence and resolution of solar images have been increasing dramatically with the launch of new spacecraft such as STEREO and SDO. This increase in data volume provides new opportunities for solar researchers, but the efficient processing and analysis of these data create new challenges. We introduce a fuzzy-based solar feature-detection system in this article. The proposed system processes SDO/AIA images using fuzzy rules to detect coronal holes and active regions. This system is fast and it can handle different size images. It is tested on six months of solar data (1 October 2010 to 31 March 2011) to generate filling factors (ratio of area of solar feature to area of rest of the solar disc) for active regions and coronal holes. These filling factors are then compared to SDO/EVE/ESP irradiance measurements. The correlation between active-region filling factors and irradiance measurements is found to be very high, which has encouraged us to design a time-series prediction system using Radial Basis Function Networks to predict ESP irradiance measurements from our generated filling factors.

  7. Quality control of EUVE databases

    Science.gov (United States)

    John, L. M.; Drake, J.

    1992-01-01

    The publicly accessible databases for the Extreme Ultraviolet Explorer include: the EUVE Archive mailserver; the CEA ftp site; the EUVE Guest Observer Mailserver; and the Astronomical Data System node. The EUVE Performance Assurance team is responsible for verifying that these public EUVE databases are working properly, and that the public availability of EUVE data contained therein does not infringe any data rights which may have been assigned. In this poster, we describe the Quality Assurance (QA) procedures we have developed from the approach of QA as a service organization, thus reflecting the overall EUVE philosophy of Quality Assurance integrated into normal operating procedures, rather than imposed as an external, post facto, control mechanism.

  8. asan alternative to conventional spectrophotometers

    African Journals Online (AJOL)

    tant çoncentration, hydrogen ion concentration and ionic strength were obtained using the kinetic set and compared with those obtained from a Unicaın SP 1750 uv- ... solid state photometer is a rugged, reliable. low-cost alternative to commercially avail- able spectrophotometers. Its use is therefore recommended as'a ...

  9. Spectrophotometer-Based Color Measurements

    Science.gov (United States)

    2017-10-24

    evaluated using nominal values for L*a*b* (color space ) from international paint suppliers. The results demonstrate the value of using a spectrophotometer...advantage over the x, y, z tristimulus values used to describe color because they more uniformly span the visible color space . Figure 1 L*a*b...diagram UNCLASSIFIED Approved for public release; distribution is unlimited. UNCLASSIFIED 3 There are many possible metrics to express the

  10. Shutter mechanism for spacecraft spectrophotometer

    Science.gov (United States)

    Weilbach, A.

    1972-01-01

    A shutter mechanism is described for the backscatter ultraviolet spectrophotometer experiment on the Nimbus D satellite. The purpose of the experiment is to determine spatial distribution of atmospheric ozone from measurements of ultraviolet radiation backscattered by the earth's atmosphere. The system consists of two independent, rotary cylinder shutters, controlled by a dual star Geneva mechanism, and driven by a single stepper motor. A single driver controls a combination of two independently driven Geneva stars. Design considerations involved the use of low friction, nonmetallic materials.

  11. A Low-Cost Quantitative Absorption Spectrophotometer

    Science.gov (United States)

    Albert, Daniel R.; Todt, Michael A.; Davis, H. Floyd

    2012-01-01

    In an effort to make absorption spectrophotometry available to high school chemistry and physics classes, we have designed an inexpensive visible light absorption spectrophotometer. The spectrophotometer was constructed using LEGO blocks, a light emitting diode, optical elements (including a lens), a slide-mounted diffraction grating, and a…

  12. Method and apparatus for calibrating spectrophotometers

    NARCIS (Netherlands)

    Schreutelkamp, F.H.

    2003-01-01

    The present invention relates to a method of calibrating spectrophotometers by placing one or more filters in the light path of the spectrophotometer and measuring the amount of radiation by means of a detector. The present invention furthermore relates to an apparatus to be used with such a method.

  13. ESP terminology

    Science.gov (United States)

    Eremina, Svetlana V.

    2006-07-01

    English for Specific Purposes (ESP) is a part of General English used in the subject specific area. It consists of three main categories, namely, general vocabulary, general academic vocabulary, subject-specific vocabulary units; the last one is considered to be the terms. The general methods and techniques for constructing new and evaluating the present system of terms to be accomplished both by scientists and linguists are discussed.

  14. How calibration and reference spectra affect the accuracy of absolute soft X-ray solar irradiance measured by the SDO/EVE/ESP during high solar activity

    Science.gov (United States)

    Didkovsky, Leonid; Wieman, Seth; Woods, Thomas

    2016-10-01

    The Extreme ultraviolet Spectrophotometer (ESP), one of the channels of SDO's Extreme ultraviolet Variability Experiment (EVE), measures solar irradiance in several EUV and soft x-ray (SXR) bands isolated using thin-film filters and a transmission diffraction grating, and includes a quad-diode detector positioned at the grating zeroth-order to observe in a wavelength band from about 0.1 to 7.0 nm. The quad diode signal also includes some contribution from shorter wavelength in the grating's first-order and the ratio of zeroth-order to first-order signal depends on both source geometry, and spectral distribution. For example, radiometric calibration of the ESP zeroth-order at the NIST SURF BL-2 with a near-parallel beam provides a different zeroth-to-first-order ratio than modeled for solar observations. The relative influence of "uncalibrated" first-order irradiance during solar observations is a function of the solar spectral irradiance and the locations of large Active Regions or solar flares. We discuss how the "uncalibrated" first-order "solar" component and the use of variable solar reference spectra affect determination of absolute SXR irradiance which currently may be significantly overestimated during high solar activity.

  15. EUVE Observations of Nonmagnetic Cataclysmic Variables

    Energy Technology Data Exchange (ETDEWEB)

    Mauche, C W

    2001-09-05

    The authors summarize EUVE's contribution to the study of the boundary layer emission of high accretion-rate nonmagnetic cataclysmic variables, especially the dwarf novae SS Cyg, U Gem, VW Hyi, and OY Car in outburst. They discuss the optical and EUV light curves of dwarf nova outbursts, the quasi-coherent oscillations of the EUV flux of SS Cyg, the EUV spectra of dwarf novae, and the future of EUV observations of cataclysmic variables.

  16. Radiometry for the EUV lithography; Radiometrie fuer die EUV-Lithographie

    Energy Technology Data Exchange (ETDEWEB)

    Scholze, Frank [Physikalisch-Technische Bundesanstalt (PTB), Berlin (Germany). Arbeitsgruppe ' EUV-Radiometrie' ; Laubis, Christian; Barboutis, Annett; Buchholz, Christian; Fischer, Andreas; Puls, Jana; Stadelhoff, Christian

    2014-12-15

    The EUV reflectrometry at the PTB storage BESSY I and BESSY II is described. Results on the reflectivities of some EUV mirrors are presented. Finally the spectral sensitivities of different photodiodes used as EUV detectors are presented. (HSI)

  17. High sensitivity chemically amplified EUV resists through enhanced EUV absorption

    Science.gov (United States)

    Ongayi, Owendi; Christianson, Matthew; Meyer, Matthew; Coley, Suzanne; Valeri, David; Kwok, Amy; Wagner, Mike; Cameron, Jim; Thackeray, Jim

    2012-03-01

    Resolution, line edge roughness, sensitivity and low outgassing are the key focus points for extreme ultraviolet (EUV) resist materials. Sensitivity has become increasingly important so as to address throughput concerns in device manufacturing and compensate for the low power of EUV sources. Recent studies have shown that increasing the polymer linear absorption absorption coefficient in EUV resists translates to higher acid generation efficiency and good pattern formation. In this study, novel high absorbing polymer platforms are evaluated. The contributing effect of the novel absorbing chromophore to the resultant chemically amplified photoresist is evaluated and compared with a standard methacrylate PAG Bound Polymer (PBP) platform. We report that by increasing EUV absorption, we cleanly resolved 17 nm 1:1 line space can be achieved at a sensitivity of 14.5 mJ/cm2, which is consistent with dose requirements dictated by the ITRS roadmap. We also probe the effect of fluorinated small molecule additives on acid yield generation (Dil C) at EUV of a PBP platform.

  18. The Fuge Tube Diode Array Spectrophotometer

    Science.gov (United States)

    Arneson, B. T.; Long, S. R.; Stewart, K. K.; Lagowski, J. J.

    2008-01-01

    We present the details for adapting a diode array UV-vis spectrophotometer to incorporate the use of polypropylene microcentrifuge tubes--fuge tubes--as cuvettes. Optical data are presented validating that the polyethylene fuge tubes are equivalent to the standard square cross section polystyrene or glass cuvettes generally used in…

  19. Enzyme Activity Experiments Using a Simple Spectrophotometer

    Science.gov (United States)

    Hurlbut, Jeffrey A.; And Others

    1977-01-01

    Experimental procedures for studying enzyme activity using a Spectronic 20 spectrophotometer are described. The experiments demonstrate the effect of pH, temperature, and inhibitors on enzyme activity and allow the determination of Km, Vmax, and Kcat. These procedures are designed for teaching large lower-level biochemistry classes. (MR)

  20. Data comparison between two dental spectrophotometers

    NARCIS (Netherlands)

    Khashayar, G.; Dozic, A.; Kleverlaan, C.J.; Feilzer, A.J.

    2012-01-01

    Objectives: The objective of this study was to clinically test whether the data from two different spectrophotometers, based on spot and surface measurements, can be compared. Methods: Under standardized clinical conditions two devices (Vita Easyshade and SpectroShade-Micro) were used to record the

  1. Metrology qualification of EUV resists

    Science.gov (United States)

    Gershtein, Liraz; Peltinov, Ram; Ventola, Stefano; Masia, Claudio; Xing, Chanjuan

    2010-03-01

    The ASML extreme ultraviolet lithography (EUV) alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development for sub-40-nm technology. Two exposure tools are installed in two research centers. The main topic of this paper is the examination of the measured pattern roughness LER contributed by measurement (SEM), exposure (EUV exposure tool) and the resists itself. The authors also examined suspected metrology SEM challenges on different EUV resist types exposed by one of the EUV demo tools. Standard CD SEM tests, such as precision and shrinkage were performed in order to get best working conditions. As part of the research, special attention was given to expected electron - material interactions, such as resist's slimming, low contrast and contamination build up on both lines. LER was analyzed in order to determine separately the contribution effect of the exposure tool and the different resists. Additional comparison was performed on different CDs with different orientations and densities.

  2. Secondary Electrons in EUV Lithography

    Energy Technology Data Exchange (ETDEWEB)

    Torok, Justin; Re, Ryan Del; Herbol, Henry; Das, Sanjana; Bocharova, Irina; Paolucci, Angela; Ocola, Leonidas E.; Ventrice Jr., Carl; Lifshin, Eric; Denbeaux, Greg; Brainard, Robert L.

    2013-01-01

    Secondary electrons play critical roles in several imaging technologies, including extreme ultraviolet (EUV) lithography. At longer wavelengths of light (e.g. 193 and 248 nm), the photons are directly involved in the photochemistry occurring during photolysis. EUV light (13.5 nm, 92 eV), however, first creates a photoelectron, and this electron, or its subsequent daughter electrons create most of the chemical changes that occur during exposure. Despite the importance of these electrons, the details surrounding the chemical events leading to acid production remain poorly understood. Previously reported experimental results using high PAG-loaded resists have demonstrated that up to five or six photoacids can be generated per incident photon. Until recently, only electron recombination events were thought to play a role in acid generation, requiring that at least as many secondary electrons are produced to yield a given number of acid molecules. However, the initial results we have obtained using a Monte Carlo-based modeling program, LESiS, demonstrate that only two to three secondary electrons are made per absorbed EUV photon. A more comprehensive understanding of EUV-induced acid generation is therefore needed for the development of higher performance resists

  3. Worldwide Status of EUV Astronomy

    Science.gov (United States)

    Kowalski, Michael P.; Wood, K. S.; Barstow, M. A.

    2013-01-01

    The bulk of radiation from million-degree plasmas is emitted at EUV wavelengths, which include critical spectral features containing diagnostic information often not available at other wavelengths (e.g., He II Ly series 228-304 Å). Thus, EUV astrophysics (Barstow & Holberg 2003) presents opportunities for intriguing results obtainable with sensitive high-resolution spectroscopy and particularly applicable to hot plasmas in stellar coronae, white dwarfs and the interstellar medium. The US-built J-PEX spectrometer has flown twice on sounding rockets, observing and publishing results on two white dwarf targets (Cruddace et al. 2002, Barstow et al. 2005, Kowalski et al. 2011). Using multilayer-grating technology, J-PEX delivers both high effective area and the world's highest resolution in EUV, greater than Chandra at adjacent energies, but in a waveband Chandra cannot reach. However, the US program has been stalled by inability to obtain further NASA sounding rocket flights. A high level of technology readiness, plus important questions answerable solely with that technology, does not seem sufficient to win support. Nor is the substantial amount of resources invested into technology development over two decades, supported by NASA, DoD, and European partners. Proposals to turn the instrument or its technology into small satellite-based surveys have been made (results to be described) in the US and Europe, but the overall situation is precarious. The entire EUV astrophysics field is losing out on an opportunity, and is at risk of fading away, with forced discard of established assets. Only mobilization of the international EUV community -- unifying European, US, and perhaps others -- can reverse this situation. Our poster summarizes science quests within reach of proven technology, gives a current snapshot of that technology, and provides a summary of worldwide efforts to obtain necessary space access in NASA, ESA, and elsewhere. A process for building and maintaining

  4. EUV optics in photoionization experiments

    Science.gov (United States)

    Bartnik, Andrzej; Wachulak, Przemysław; Fiedorowicz, Henryk; Fok, Tomasz; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Anna; Szczurek, Mirosław; Pina, Ladislav; Sveda, Libor

    2013-05-01

    In this work photoionized plasmas were created by irradiation of He, Ne and Ar gases with a focused EUV beam from one of two laser-plasma sources employing Nd:YAG laser systems of different parameters. First of them was a 10-Hz laser-plasma EUV source, based on a double-stream gas-puff target, irradiated with the 3-ns/0.8J laser pulse. EUV radiation in this case was focused using a gold-plated grazing incidence ellipsoidal collector in the wavelength range λ = 9÷70 nm. The most intense emission was in the relatively narrow spectral region centred at λ = 11 +/- 1 nm. The second source was based on a 10 ns/10 J/10 Hz laser system. In this case EUV radiation was focused using a gold-plated grazing incidence multifoil collector or a Mo-coated ellipsoidal collector. The most intense emission in this case was in the 5 ÷ 15 nm spectral region. Radiation fluence ranged from 60 mJ/cm2 to 400 mJ/cm2. Different gases were injected into the interaction region, perpendicularly to an optical axis of the irradiation system, using an auxiliary gas puff valve. Irradiation of the gases resulted in ionization and excitation of atoms and ions. Spectra in EUV range were measured using a grazing incidence, flat-field spectrometer (McPherson Model 251), equipped with a 450 lines/mm toroidal grating. In all cases the most intense emission lines were assigned to singly charged ions. The other emission lines belong to atoms or doubly charged ions. The spectra were excited in low density gases of the order of 1 ÷ 10% atmospheric density.

  5. What can ESP do ?

    Science.gov (United States)

    Noguchi, Judy

    ESP (English for Specific Purposes) has been the focus of much attention recently but the question arises of “what can ESP do?” Proposed here are three things that are possible with ESP. The first is using ESP as a tool to help students who are not English majors learn how language “works” via the concept of genre texts. The second is using an ESP approach to simulate professional communication contexts in order to raise student interest and motivation. The third is to aim for ESP bilingualism, which is a realistic and attainable goal. All three points will be illustrated with specific examples.

  6. SphinX soft X-ray spectrophotometer: Science objectives, design and performance

    Science.gov (United States)

    Gburek, S.; Sylwester, J.; Kowalinski, M.; Bakala, J.; Kordylewski, Z.; Podgorski, P.; Plocieniak, S.; Siarkowski, M.; Sylwester, B.; Trzebinski, W.; Kuzin, S. V.; Pertsov, A. A.; Kotov, Yu. D.; Farnik, F.; Reale, F.; Phillips, K. J. H.

    2011-06-01

    The goals and construction details of a new design Polish-led X-ray spectrophotometer are described. The instrument is aimed to observe emission from entire solar corona and is placed as a separate block within the Russian TESIS X- and EUV complex aboard the CORONAS-PHOTON solar orbiting observatory. SphinX uses silicon PIN diode detectors for high time resolution measurements of the solar spectra in the range 0.8-15 keV. Its spectral resolution allows for discerning more than hundred separate energy bands in this range. The instrument dynamic range extends two orders of magnitude below and above these representative for GOES. The relative and absolute accuracy of spectral measurements is expected to be better than few percent, as follows from extensive ground laboratory calibrations.

  7. ESP Administration and ESP Teacher Training.

    Science.gov (United States)

    Swales, John; L'Estrange, Hugh

    1983-01-01

    Discusses the case study approach incorporated into a course in English for Specific Purposes (ESP) Administration for graduate students at the University of Aston (Birmingham). Authors cite the need for such a course, noting that a good knowledge of course design, methodology, and materials production will not turn an ESP teacher into a future…

  8. Brewer spectrophotometer measurements in the Canadian Arctic

    Science.gov (United States)

    Kerr, J. B.; Evans, W. F. J.

    1988-01-01

    In the winters of 1987 and 1988 measurements were conducted with the Brewer Spectrophotometer at Alert (82.5 N) and Resolute (74.5 N). The measurements were conducted as part of our Canadian Program to search for an Arctic Ozone Hole (CANOZE). Ozone measurements were conducted in the months of December, January and February using the moon as a light source. The total ozone measurements will be compared with ozonesonde profiles, from ECC sondes, flown once per week from Alert and Resolute. A modified Brewer Spectrophotometer was used in a special study to search for chlorine dioxide at Alert in March 1987. Ground based observations at Saskatoon in February and at Alert in March 1987 failed to detect any measureable chlorine dioxide. Interference from another absorbing gas, which we speculate may be nitrous acid, prevented the measurements at the low levels of chlorine dioxide detected in the Southern Hemisphere by Solomon et al.

  9. A Simple Spectrophotometer Using Common Materials and a Digital Camera

    Science.gov (United States)

    Widiatmoko, Eko; Widayani; Budiman, Maman; Abdullah, Mikrajuddin; Khairurrijal

    2011-01-01

    A simple spectrophotometer was designed using cardboard, a DVD, a pocket digital camera, a tripod and a computer. The DVD was used as a diffraction grating and the camera as a light sensor. The spectrophotometer was calibrated using a reference light prior to use. The spectrophotometer was capable of measuring optical wavelengths with a…

  10. Highly Stable, Large Format EUV Imager Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Higher detection efficiency and better radiation tolerance imagers are needed for the next generation of EUV instruments. Previously, CCD technology has demonstrated...

  11. [Assessment of tooth bleaching efficacy with spectrophotometer].

    Science.gov (United States)

    Zhu, Wenhao; Liu, Chang; Pan, Jie

    2014-06-01

    To analyze the changes in CIE L*, a*, and b* at cervical, body, and incisal sites after tooth bleaching by using a spectrophotometer. Sixty-seven intact and healthy maxillary central incisors were in-vestigated. These incisors were darker than A3 according to the Vita Classical shade guide. The CIE tooth shade parameters L*, a*, and b* were simultaneously recorded at three tooth areas (cervical, body, and incisal) with a spectrophotometer before and after tooth bleaching (35%H2O2 coordinating with Beyond whitening accelerator irradiating). The shade dif-ferential (DeltaE) was calculated. ANOVA, paired t-test, and Pearson correlation analysis were used for data analysis. The efficacy rates of tooth bleaching were satisfactory, with 86.6%, 86.6%, and 85.1% in the cervical, body, and incisal sites, respectively. The average values of DeltaE were 5.09, 4.44, and 4.40 in the cervical, body, and incisal sites. Tooth bleaching significantly increased L* and significantly decreased a* and b* in all tooth areas (P spectrophotometer could objectively evaluate the whitening effect of tooth bleaching at the different tooth sites. The tooth bleaching system (35%H202 coordinating with Beyond whitening accelerator irradiating) exerts powerful bleaching actions in most of the tooth areas investigated. The order of tooth bleaching effectiveness is cervicalbody>incisal. Yellow coloration is decreased mainly at the cervical site, and brightness was increased mostly at theincisal site. The effectiveness of tooth bleaching increases as the baseline b* value increases.

  12. A multi-channel coronal spectrophotometer.

    Science.gov (United States)

    Landman, D. A.; Orrall, F. Q.; Zane, R.

    1973-01-01

    We describe a new multi-channel coronal spectrophotometer system, presently being installed at Mees Solar Observatory, Mount Haleakala, Maui. The apparatus is designed to record and interpret intensities from many sections of the visible and near-visible spectral regions simultaneously, with relatively high spatial and temporal resolution. The detector, a thermoelectrically cooled silicon vidicon camera tube, has its central target area divided into a rectangular array of about 100,000 pixels and is read out in a slow-scan (about 2 sec/frame) mode. Instrument functioning is entirely under PDP 11/45 computer control, and interfacing is via the CAMAC system.

  13. Far-infrared spectrophotometer for astronomical observations

    Science.gov (United States)

    Moseley, H.; Silverberg, R. F.

    1981-01-01

    A liquid-helium-cooled far infrared spectrophotometer was built and used to make low resolution observations of the continua of several kinds of astronomical objects using the Kuiper Airborne Observatory. This instrument fills a gap in both sensitivity to continuum sources and spectral resolution between the broadband photometers with lambda/Delta lambda approximately 1 and spectrometers with lambda/Delta lambda greater than 50. While designed primarily to study planetary nebulae, the instrument permits study of the shape of the continua of many weak sources which cannot easily be observed with high resolution systems.

  14. Data comparison between two dental spectrophotometers.

    Science.gov (United States)

    Khashayar, G; Dozic, A; Kleverlaan, C J; Feilzer, A J

    2012-01-01

    The objective of this study was to clinically test whether the data from two different spectrophotometers, based on spot and surface measurements, can be compared. Under standardized clinical conditions two devices (Vita Easyshade and Spectro Shade-Micro) were used to record the color of three areas (cervical, middle, and incisal) per tooth for three upper maxillary anterior teeth in 102 participants. Each position was measured three times to attain an average for the CIE L*a*b* coordinates and to attain the corresponding Vita Classical shade tab integrated in the software of both devices. Vita tabs were also described as L*a*b* values using earlier published translations so that color differences (ΔE) could be calculated between them. The regression analysis between the two devices showed that the independent correlation coefficients of the L*a*b* values are low. Yet when the suggested shade codes are compared with Vita colors instead of L*a*b*, 40% of the cases were equal and 51% were clinically acceptable. According to this study the two devices do not give a comparable shade selection output, and thus the exchange of L*a*b* values between the two spectrophotometers cannot be recommended.

  15. Contamination Effects on EUV Optics

    Science.gov (United States)

    Tveekrem, J.

    1999-01-01

    During ground-based assembly and upon exposure to the space environment, optical surfaces accumulate both particles and molecular condensibles, inevitably resulting in degradation of optical instrument performance. Currently, this performance degradation (and the resulting end-of-life instrument performance) cannot be predicted with sufficient accuracy using existing software tools. Optical design codes exist to calculate instrument performance, but these codes generally assume uncontaminated optical surfaces. Contamination models exist which predict approximate end-of-life contamination levels, but the optical effects of these contamination levels can not be quantified without detailed information about the optical constants and scattering properties of the contaminant. The problem is particularly pronounced in the extreme ultraviolet (EUV, 300-1,200 A) and far (FUV, 1,200-2,000 A) regimes due to a lack of data and a lack of knowledge of the detailed physical and chemical processes involved. Yet it is in precisely these wavelength regimes that accurate predictions are most important, because EUV/FUV instruments are extremely sensitive to contamination.

  16. EUV mask process specifics and development challenges

    Science.gov (United States)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  17. Carbon contamination topography analysis of EUV masks

    Energy Technology Data Exchange (ETDEWEB)

    Fan, Y.-J.; Yankulin, L.; Thomas, P.; Mbanaso, C.; Antohe, A.; Garg, R.; Wang, Y.; Murray, T.; Wuest, A.; Goodwin, F.; Huh, S.; Cordes, A.; Naulleau, P.; Goldberg, K. A.; Mochi, I.; Gullikson, E.; Denbeaux, G.

    2010-03-12

    The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

  18. [Design of Dual-Beam Spectrometer in Spectrophotometer for Colorimetry].

    Science.gov (United States)

    Liu, Yi-xuan; Yan, Chang-xiang

    2015-07-01

    Spectrophotometers for colorimetry are usually composed of two independent and identical spectrometers. In order to reduce the volume of spectrophotometer for colorimetry, a design method of double-beam spectrometer is put forward. A traditional spectrometer is modified so that a new spectrometer can realize the function of double spectrometers, which is especially suitable for portable instruments. One slit is replaced by the double-slit, than two beams of spectrum can be detected. The working principle and design requirement of double-beam spectrometer are described. A spectrometer of portable spectrophotometer is designed by this method. A toroidal imaging mirror is used for the Czerny-Turner double-beam spectrometer in this paper, which can better correct astigmatism, and prevent the dual-beam spectral crosstalk. The results demonstrate that the double-beam spectrometer designed by this method meets the design specifications, with the spectral resolution less than 10 nm, the spectral length of 9.12 mm, and the volume of 57 mm x 54 mm x 23 mm, and without the dual-beam spectral overlap in the detector either. Comparing with a traditional spectrophotometer, the modified spectrophotometer uses a set of double-beam spectrometer instead of two sets of spectrometers, which can greatly reduce the volume. This design method can be specially applied in portable spectrophotometers, also can be widely applied in other double-beam spectrophotometers, which offers a new idea for the design of dual-beam spectrophotometers.

  19. EUV lithography imaging using novel pellicle membranes

    Science.gov (United States)

    Pollentier, Ivan; Vanpaemel, Johannes; Lee, Jae Uk; Adelmann, Christoph; Zahedmanesh, Houman; Huyghebaert, Cedric; Gallagher, Emily E.

    2016-03-01

    EUV mask protection against defects during use remains a challenge for EUV lithography. A stand-off protective membrane - a pellicle - is targeted to prevent yield losses in high volume manufacturing during handling and exposure, just as it is for 193nm lithography. The pellicle is thin enough to transmit EUV exposure light, yet strong enough to remain intact and hold any particles out of focus during exposure. The development of pellicles for EUV is much more challenging than for 193nm lithography for multiple reasons including: high absorption of most materials at EUV wavelength, pump-down sequences in the EUV vacuum system, and exposure to high intensity EUV light. To solve the problems of transmission and film durability, various options have been explored. In most cases a thin core film is considered, since the deposition process for this is well established and because it is the simplest option. The transmission specification typically dictates that membranes are very thin (~50nm or less), which makes both fabrication and film mechanical integrity difficult. As an alternative, low density films (e.g. including porosity) will allow thicker membranes for a given transmission specification, which is likely to improve film durability. The risk is that the porosity could influence the imaging. At imec, two cases of pellicle concepts based on reducing density have been assessed : (1) 3D-patterned SiN by directed self-assembly (DSA), and (2) carbon nanomaterials such as carbon nanotubes (CNT) and carbon nanosheets (CNS). The first case is based on SiN membranes that are 3D-patterned by Directed Self Assembly (DSA). The materials are tested relative to the primary specifications: EUV transmission and film durability. A risk assessment of printing performance is provided based on simulations of scattered energy. General conclusions on the efficacy of various approaches will provided.

  20. Nanoplasmonic generation of ultrashort EUV pulses

    Science.gov (United States)

    Choi, Joonhee; Lee, Dong-Hyub; Han, Seunghwoi; Park, In-Yong; Kim, Seungchul; Kim, Seung-Woo

    2012-10-01

    Ultrashort extreme-ultraviolet (EUV) light pulses are an important tool for time-resolved pump-probe spectroscopy to investigate the ultrafast dynamics of electrons in atoms and molecules. Among several methods available to generate ultrashort EUV light pulses, the nonlinear frequency upconversion process of high-harmonic generation (HHG) draws attention as it is capable of producing coherent EUV pulses with precise control of burst timing with respect to the driving near-infrared (NIR) femtosecond laser. In this report, we present and discuss our recent experimental data obtained by the plasmon-driven HHG method that generate EUV radiation by means of plasmonic nano-focusing of NIR femtosecond pulses. For experiment, metallic waveguides having a tapered hole of funnel shape inside were fabricated by adopting the focused-ion-beam process on a micro-cantilever substrate. The plasmonic field formed within the funnelwaveguides being coupled with the incident femtosecond pulse permitted intensity enhancement by a factor of ~350, which creates a hot spot of sub-wavelength size with intensities strong enough for HHG. Experimental results showed that with injection of noble gases into the funnel-waveguides, EUV radiation is generated up to wavelengths of 32 nm and 29.6 nm from Ar and Ne gas atoms, respectively. Further, it was observed that lower-order EUV harmonics are cut off in the HHG spectra by the tiny exit aperture of the funnel-waveguide.

  1. A UV-Vis photoacoustic spectrophotometer.

    Science.gov (United States)

    Wiegand, Joseph R; Mathews, L Dalila; Smith, Geoffrey D

    2014-06-17

    A novel photoacoustic spectrophotometer (PAS) for the measurement of gas-phase and aerosol absorption over the UV-visible region of the spectrum is described. Light from a broadband Hg arc lamp is filtered in eight separate bands from 300 to 700 nm using bandpass interference filters (centered at 301 nm, 314 nm, 364 nm, 405 nm, 436 nm, 546 nm, 578 and 687 nm) and modulated with an optical chopper before entering the photoacoustic cell. All wavelength bands feature a 20-s detection limit of better than 3.0 Mm(-1) with the exception of the lower-intensity 687 nm band for which it is 10.2 Mm(-1). Validation measurements of gas-phase acetone and nigrosin aerosol absorption cross sections at several wavelengths demonstrate agreement to within 10% with those measured previously (for acetone) and those predicted by Mie theory (for nigrosin). The PAS instrument is used to measure the UV-visible absorption spectrum of ambient aerosol demonstrating a dramatic increase in the UV region with absorption increasing by 300% from 405 to 301 nm. This type of measurement throughout the UV-visible region and free from artifacts associated with filter-based methods has not been possible previously, and we demonstrate its promise for classifying and quantifying different types of light-absorbing ambient particles.

  2. EUV-mirror, optical system with EUV-mirror and associated operating method

    NARCIS (Netherlands)

    Dinger, U.; Bijkerk, Frederik; Bayraktar, Muharrem; Dier, O.

    2016-01-01

    An EUV mirror (1000) has a mirror element which forms a mirror surface of the mirror. The mirror element has a substrate (1020) and a multilayer arrangement (1030) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV). The

  3. The Soft X-ray Spectrophotometer SphinX for the CORONAS-Photon Mission

    Science.gov (United States)

    Sylwester, Janusz; Kowalinski, Miroslaw; Szymon, Gburek; Bakala, Jaroslaw; Kuzin, Sergey; Kotov, Yury; Farnik, Frantisek; Reale, Fabio

    The purpose, construction details and calibration results of the new design, Polish-led solar X-ray spectrophotometer SphinX will be presented. The instrument constitutes a part of the Russian TESIS X-ray and EUV complex aboard the forthcoming CORONAS-Photon solar mission to be launched later in 2008. SphinX uses Si-PIN detectors for high time resolution (down to 0.01 s) measurements of solar spectra in the energy range between 0.5 keV and 15 keV. The spectral resolution allows separating 256 individual energy channels in this range with particular groups of lines clearly distinguishable. Unprecedented accuracy of the instrument calibration at the XACT (Palermo) and BESSY (Berlin) synchrotron will allow for establishing the solar soft X-ray photometric reference system. The cross-comparison between SphinX and the other instruments presently in orbit like XRT on Hinode, RHESSI and GOES X-ray monitor, will allow for a precise determination of the coronal emission measure and temperature during both very low and very high activity periods. Examples of the detectors' ground calibration results as well as the calculated synthetic spectra will be presented. The operation of the instrument while in orbit will be discussed allowing for suggestions from other groups to be still included in mission planning.

  4. An Airborne Spectrophotometer for Investigating Solar Absorption on Venus

    Science.gov (United States)

    Gero, J.; Limaye, S.; Fry, P.; Lee, Y. J.; Petty, G.; Taylor, J.; Warwick, S.

    2017-11-01

    We propose to develop a compact airborne spectrophotometer for Venus, to measure short wavelength (330-600 nm) spectra of downwelling sunlight, which will facilitate the identification of presently unknown UV absorbers in its atmosphere.

  5. Fundamentals of EUV resist-inorganic hardmask interactions

    Science.gov (United States)

    Goldfarb, Dario L.; Glodde, Martin; De Silva, Anuja; Sheshadri, Indira; Felix, Nelson M.; Lionti, Krystelle; Magbitang, Teddie

    2017-03-01

    High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardmasks (HMs) as etch transfer layers for EUV patterning. Ultrathin (lessons learned in this work can be directly applied to the engineering of EUV resist materials and processes specifically designed to work on such novel HMs.

  6. Design and fabrication of advanced EUV diffractive elements

    Energy Technology Data Exchange (ETDEWEB)

    Naulleau, Patrick P.; Liddle, J. Alexander; Salmassi, Farhad; Anderson, Erik H.; Gullikson, Eric M.

    2003-11-16

    As extreme ultraviolet (EUV) lithography approaches commercial reality, the development of EUV-compatible diffractive structures becomes increasingly important. Such devices are relevant to many aspects of EUV technology including interferometry, illumination, and spectral filtering. Moreover, the current scarcity of high power EUV sources makes the optical efficiency of these diffractive structures a paramount concern. This fact has led to a strong interest in phase-enhanced diffractive structures. Here we describe recent advancements made in the fabrication of such devices.

  7. THE LIMITS OF ESP TESTS

    Directory of Open Access Journals (Sweden)

    Norica-Felicia BUCUR

    2015-07-01

    Full Text Available Global market forces have determined not only higher education institutions all over the world to include ESP courses in their curriculum to enhance their students’ future employability, but also public and private organisations to offer their employees the opportunity to attend ESP courses in order to meet the continuously growing ESP needs. From this perspective, ESP compentence could become a subcomponent of one of the key competences for lifelong learning, communication in foreign languages. Therefore assessing ESP competence seems to acquire paramount importance since stakeholders need accurate information about the ESP learners’ abilities to cope with specific language tasks. This article offers a concise overview of the principles and practices of ESP assessment, a detailed description of the features of ESP tests, while focusing particularly on the limits of ESP tests in order to identify possible solutions to overcome them.

  8. Metal Oxide Nanoparticle Photoresists for EUV Patterning

    KAUST Repository

    Jiang, Jing

    2014-01-01

    © 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have achieved high resolution (∼22 nm) at a very high EUV sensitivity (4.2 mJ/cm2). Further investigations into the patterning process suggests a ligand displacement mechanism, wherein, any combination of a metal oxide with the correct ligand could generate patterns in the presence of the suitable photoactive compound. The current investigation extends this study by developing new nanoparticle compositions with transdimethylacrylic acid and o-toluic acid ligands. This study describes their synthesis and patterning performance under 248 nm KrF laser (DUV) and also under 13.5 nm EUV exposures (dimethylacrylate nanoparticles) for the new resist compositions.

  9. EUV repair process optimization and integration

    Science.gov (United States)

    Nesládek, Pavel; Lajn, Alexander; Schedel, Thorsten; Bender, Markus

    2017-07-01

    EUV technology is according to current trend approaching the final development phase in which defect free EUV masks are of key importance for development and optimization of the lithography process. This task consists of three contributing aspects- defect free multilayer blank, mask manufacturing process with very low defect formation probability and availability of repair process for EUV mask. In comparison to optical mask, development of the repair process for EUV mask is different in several aspects. The fact, that the TaN absorber is placed on top of Mo/Si mirror is making the process very sensitive to variation of the mask material, as the etch rate of the mirror is significantly higher, than that of absorber, when no capping layer is present between the absorber and ML mirror. The presence of the Ru capping layer increases the process window due to significant selectivity improvement by one or two orders of magnitude, however, the capping layer is very sensitive to damage by preceding manufacturing processes. Its thickness and also it chemical purity - lack of modification by incorporation of impurities is crucial for successful mask repair. The repair process for optical masks is typically optimized using AIMS for both development and qualification of the process. The availability of EUV AIMS system is very limited, for what reason we have to rely on other measures during the process development and use the AIMS for process qualification only, or use correlation between e.g. CD SEM or AFM measurement and AIMS data for selection and qualification of the repair process. Also the usage of mask - exposure on the scanner is modifying the mask surface. Therefore the impact of the mask exposure needs to be investigated, when EUV gets in HVM stage. In the past, the influence of the mask cleaning process on the integrity of EUV mask was investigated, with respect to several lithography-critical parameters as actinic reflectivity, critical dimension (CD) shift, edge

  10. Teaching Creatively in ESP

    Science.gov (United States)

    Petkovska, Viktorija

    2015-01-01

    Teaching creatively in ESP might in certain cases present some appropriate solutions to the teaching situation and, more importantly, boost students' confidence and motivation towards achieving some of the course objectives. Based on a case study, this paper displays some of the results obtained through a limited scope research conducted with…

  11. ESP - Believe It Or Not!

    Science.gov (United States)

    McCormack, Alan J.

    1974-01-01

    Describes several well documented cases of Extra Sensory Perception (ESP), and discusses ways in which ESP experiments can be conducted in the science classroom to investigate telepathy, pyschokinesis, and clairvoyance. (JR)

  12. Oxidation and metal contamination of EUV optics

    NARCIS (Netherlands)

    Sturm, Jacobus Marinus; Liu, Feng; Pachecka, Malgorzata; Lee, Christopher James; Bijkerk, Frederik

    2013-01-01

    The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding

  13. EUV micropatterning for biocompatibility control of PET

    Science.gov (United States)

    Reisinger, B.; Fahrner, M.; Frischauf, I.; Yakunin, S.; Svorcik, V.; Fiedorowicz, H.; Bartnik, A.; Romanin, C.; Heitz, J.

    2010-08-01

    We have investigated the influence of oriented microstructures at modified polyethylene terephthalate (PET) on the adhesion and alignment of Chinese hamster ovary (CHO) cells. For surface modification, the PET foils were exposed to the radiation of a laser-plasma extreme ultraviolet (EUV) source based on a double-stream gas-puff target. The emission of the plasma was focused onto the samples by means of a gold-plated ellipsoidal collector. The spectrum of the focused radiation covered the wavelength range from 9 to 70 nm. The PET samples were irradiated with the EUV pulses at a repetition rate of 10 Hz in a high vacuum. For control experiments, PET samples were also irradiated in air with the light of a 193 nm ArF-excimer laser. Different kinds of surface microstructures were obtained depending on the EUV or laser fluence and pulse number, including oriented wall- and ripple-type structures with lateral structure periods of a few µm. The surface morphology of polymer samples after the irradiation was investigated using a scanning electron microscope (SEM). Changes in chemical surface structure of the irradiated samples were investigated using X-ray photoelectron spectroscopy (XPS). We demonstrated that the cells show good adhesion and align along oriented wall- and ripple-type microstructures on PET surfaces produced by the EUV irradiation.

  14. ESP--Things Fall Apart?

    Science.gov (United States)

    Waters, Alan

    This paper asserts that a gap is developing in English for Special Purposes (ESP) between theory and practice, between received wisdom and grassroots activity that are important to understand when considering the future of ESP. Evidence for these gaps in ESP are discussed in detail in the context of course design, academic input, and the…

  15. Hand-held spectrophotometer design for textile fabrics

    Science.gov (United States)

    Böcekçi, Veysel Gökhan; Yıldız, Kazım

    2017-09-01

    In this study, a hand-held spectrophotometer was designed by taking advantage of the developments in modern optoelectronic technology. Spectrophotometer devices are used to determine the color information from the optic properties of the materials. As an alternative to a desktop spectrophotometer device we have implemented, it is the first prototype, low cost and portable. The prototype model designed for the textile industry can detect the color tone of any fabric. The prototype model consists of optic sensor, processor, display floors. According to the color applied on the optic sensor, it produces special frequency information on its output at that color value. In Arduino type processor, the frequency information is evaluated by the program we have written and the color tone information between 0-255 ton is decided and displayed on the screen.

  16. STUDY OF VARIOUS SOLVENTS FOR PHOLCODINE DETERMINATION USING UV SPECTROPHOTOMETER

    OpenAIRE

    Ajay Sharma

    2013-01-01

    Pholcodine is an opioid cough suppressant (anti-tussive). The objective of this work was study of various solvents for Pholcodine determination using UV Spectrophotometer and to develop a new method for determination of the Pholcodine by using UV-Visible Spectrophotometer that would be more accurate and cheapest. A number of solvents were used during the study those were methanol, chloroform, water, 0.1N KOH and 0.1N HCL that were soluble in Pholcodine and by using absorbance method at (285±...

  17. Reliability of shade selection using an intraoral spectrophotometer.

    Science.gov (United States)

    Witkowski, Siegbert; Yajima, Nao-Daniel; Wolkewitz, Martin; Strub, Jorge R

    2012-06-01

    In this study, we evaluate the accuracy and reproducibility of human tooth shade selection using a digital spectrophotometer. Variability among examiners and illumination conditions were tested for possible influence on measurement reproducibility. Fifteen intact anterior teeth of 15 subjects were evaluated for their shade using a digital spectrophotometer (Crystaleye, Olympus, Tokyo, Japan) by two examiners under the same light conditions representing a dental laboratory situation. Each examiner performed the measurement ten times on the labial surface of each tooth containing three evaluation sides (cervical, body, incisal). Commission International on Illumination color space values for L* (lightness), a* (red/green), and b* (yellow/blue) were obtained from each evaluated side. Examiner 2 repeated the measurements of the same subjects under different light conditions (i.e., a dental unit with a chairside lamp). To describe measurement precision, the mean color difference from the mean metric was used. The computed confidence interval (CI) value 5.228 (4.6598-5.8615) reflected (represented) the validity of the measurements. Least square mean analysis of the values obtained by examiners 1 and 2 or under different illumination conditions revealed no statistically significant differences (CI = 95%). Within the limits of the present study, the accuracy and reproducibility of dental shade selection using the tested spectrophotometer with respect to examiner and illumination conditions reflected the reliability of this device. This study suggests that the tested spectrophotometer can be recommended for the clinical application of shade selection.

  18. Cuvette and method for measuring refractive index in a spectrophotometer

    DEFF Research Database (Denmark)

    2017-01-01

    Embodiments of the present invention include a cuvette (100) for use in determining a refractive index of a sample matter in a spectrophotometer (600), the cuvette comprising a container (102) for holding the sample matter, the container (102) having an entry window (121) that allows input...

  19. Plasma-based EUV light source

    Science.gov (United States)

    Shumlak, Uri; Golingo, Raymond; Nelson, Brian A.

    2010-11-02

    Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

  20. Thorough characterization of an EUV mask

    Science.gov (United States)

    Mizuno, Hiroyuki; McIntyre, Gregory; Koay, Chiew-seng; Burkhardt, Martin; He, Long; Hartley, John; Johnson, Corbet; Raghunathan, Sudharshanan; Goldberg, Kenneth; Mochi, Iacopo; La Fontaine, Bruno; Wood, Obert

    2009-04-01

    We reported that we were successful in our 45nm technology node device demonstration in February 2008 and 22nm node technology node device patterning in February 2009 using ASML's Alpha Demo Tool (ADT).1, 2, 3 In order to insert extreme ultraviolet (EUV) lithography at the 15nm technology node and beyond, we have thoroughly characterized one EUV mask, a so-called NOVACD mask. In this paper, we report on three topics. The first topic is an analysis of line edge roughness (LER) using a mask Scanning Electron Microscope (SEM), an Atomic Force Microscope (AFM) and the Actinic Inspection Tool (AIT) to compare resist images printed with the ASML ADT. The results of the analysis show a good correlation between the mask AFM and the mask SEM measurements. However, the resist printing results for the isolated space patterns are slightly different. The cause of this discrepancy may be resist blur, image log slope and SEM image quality and so on. The second topic is an analysis of mask topography using an AFM and relative reflectivity of mirror and absorber surface using the AIT. The AFM data show 6 and 7 angstrom rms roughness for mirror and absorber, respectively. The reflectivity measurements show that the mirror reflects EUV light about 20 times higher than absorber. The last topic is an analysis of a 32nm technology node SRAM cell which includes a comparison of mask SEM image, AIT image, resist image and simulation results. The ADT images of the SRAM pattern were of high quality even though the mask patters were not corrected for OPC or any EUV-specific effects. Image simulation results were in good agreement with the printing results.

  1. Physical processes in EUV sources for microlithography

    Energy Technology Data Exchange (ETDEWEB)

    Banine, V Y; Swinkels, G H P M [ASML Netherlands B.V., De Run 6501, 5504DR Veldhoven (Netherlands); Koshelev, K N [Institute of Spectroscopy RAS (ISAN), Fizicheskaya 5, Troitsk 142190 (Russian Federation)

    2011-06-29

    The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil very high demands both technical and cost oriented. The EUVL tool operates at a wavelength of 13.5 nm, which requires the following new developments. - The light production mechanism changes from conventional lamps and lasers to relatively high-temperature emitting plasmas. - The light transport, mainly refractive for deep ultraviolet (DUV), should be reflective for EUV. - The source specifications as derived from the customer requirements on wafer throughput mean that the output EUV source power has to be hundreds of watts. This in its turn means that tens to hundreds of kilowatts of dissipated power has to be managed in a relatively small volume. - In order to keep lithography costs as low as possible, the lifetime of the components should be as long as possible and at least of the order of thousands of hours. This poses a challenge for the sources, namely how to design and manufacture components robust enough to withstand the intense environment of high heat dissipation, flows of several keV ions as well as the atomic and particular debris within the source vessel. - As with all lithography tools, the imaging requirements demand a narrow illumination bandwidth. Absorption of materials at EUV wavelengths is extreme with extinguishing lengths of the order of tens of nanometres, so the balance between high transmission and spectral purity requires careful engineering. All together, EUV lithography sources present technological challenges in various fields of physics such as plasma, optics and material science. These challenges are being tackled by the source manufacturers and investigated extensively in the research facilities around the world. An overview of the published results on the topic as well as the analyses of the physical processes behind the proposed solutions will be presented in this paper. (topical review)

  2. EUV lithography: NXE platform performance overview

    Science.gov (United States)

    Peeters, Rudy; Lok, Sjoerd; Mallman, Joerg; van Noordenburg, Martijn; Harned, Noreen; Kuerz, Peter; Lowisch, Martin; van Setten, Eelco; Schiffelers, Guido; Pirati, Alberto; Stoeldraijer, Judon; Brandt, David; Farrar, Nigel; Fomenkov, Igor; Boom, Herman; Meiling, Hans; Kool, Ron

    2014-04-01

    The first NXE3300B systems have been qualified and shipped to customers. The NXE:3300B is ASML's third generation EUV system and has an NA of 0.33. It succeeds the NXE:3100 system (NA of 0.25), which has allowed customers to gain valuable EUV experience. Good overlay and imaging performance has been shown on the NXE:3300B system in line with 22nm device requirements. Full wafer CDU performance of Manufacturing. With the development of the MOPA+prepulse operation of the source, steps in power have been made, and with automated control the sources have been prepared to be used in a preproduction fab environment. Flexible pupil formation is under development for the NXE:3300B which will extend the usage of the system in HVM, and the resolution for the full system performance can be extended to 16nm. Further improvements in defectivity performance have been made, while in parallel full-scale pellicles are being developed. In this paper we will discuss the current NXE:3300B performance, its future enhancements and the recent progress in EUV source performance.

  3. Studies of Solar EUV Irradiance from SOHO

    Science.gov (United States)

    Floyd, Linton

    2002-01-01

    The Extreme Ultraviolet (EUV) irradiance central and first order channel time series (COC and FOC) from the Solar EUV Monitor aboard the Solar and Heliospheric observatory (SOHO) issued in early 2002 covering the time period 1/1/96-31/1201 were analyzed in terms of other solar measurements and indices. A significant solar proton effect in the first order irradiance was found and characterized. When this effect is removed, the two irradiance time series are almost perfectly correlated. Earlier studies have shown good correlation between the FOC and the Hall core-to-wing ratio and likewise, it was the strongest component of the COC. Analysis of the FOC showed dependence on the F10.7 radio flux. Analysis of the CDC signals showed additional dependences on F10.7 and the GOES x-ray fluxes. The SEM FOC was also well correlated with thein 30.4 nm channel of the SOHO EUV Imaging Telescope (EIT). The irradiance derived from all four EIT channels (30.4 nm, 17.1 nm, 28.4 nm, and 19.5 nm) showed better correlation with MgII than F10.7.

  4. EUV Doppler Imaging for CubeSat Platforms Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Mature the design and fabricate the Flare Initiation Doppler Imager (FIDI) instrument to demonstrate low-spacecraft-resource EUV technology (most notably,...

  5. Analytical techniques for mechanistic characterization of EUV photoresists

    Science.gov (United States)

    Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

    2017-03-01

    Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

  6. Novel EUV mask black border suppressing EUV and DUV OoB light reflection

    Science.gov (United States)

    Ito, Shin; Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Maruyama, Shingo; Watanabe, Genta; Yoshida, Itaru; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

    2016-05-01

    EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. This is related to the fact that EUV absorber stack reflects 1-3% of actinic EUV light. To reduce this effect several types of image border with reduced EUV reflectance (HBB) has been developed to eliminate EUV and DUV OOB light reflection by applying optical design technique and special micro-fabrication technique. A new test mask with HBB is fabricated without any degradation of mask quality according to the result of CD performance in the main pattern, defectivity and cleaning durability. The imaging performance for N10 imaging structures is demonstrated on NXE:3300B in collaboration with ASML. This result is compared to the imaging results obtained for a mask with the earlier developed BB, and HBB has achieved ~3x improvement; less than 0.2 nm CD changes are observed in the corners of the die. A CD uniformity budget including impact of OOB light in the die edge area is evaluated which shows that the OOB impact from HBB becomes comparable with other CDU contributors in this area. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

  7. CHALLENGES FACING THE ESP PRACTITIONER

    OpenAIRE

    SIMION MINODORA OTILIA

    2015-01-01

    The ESP teacher has to face certain challenges in his profession: One of the biggest challenges of the ESP teacher is the fact that he/she lacks the necessary knowledge of the subject to teach Business English, for instance, some researchers believing that such courses should be taught by subject teachers. The task of teaching ESP by ESL teachers is not an easy one. Dudley- Evans and St. John pointed out its complexity, identifying five key roles of the ESP practitioner: teacher, cou...

  8. Dobson spectrophotometer ozone measurements during international ozone rocketsonde intercomparison

    Science.gov (United States)

    Parsons, C. L.

    1980-01-01

    Measurements of the total ozone content of the atmosphere, made with seven ground based instruments at a site near Wallops Island, Virginia, are discussed in terms for serving as control values with which the rocketborne sensor data products can be compared. These products are profiles of O3 concentration with altitude. By integrating over the range of altitudes from the surface to the rocket apogee and by appropriately estimating the residual ozone amount from apogee to the top of the atmosphere, a total ozone amount can be computed from the profiles that can be directly compared with the ground based instrumentation results. Dobson spectrophotometers were used for two of the ground-based instruments. Preliminary data collected during the IORI from Dobson spectrophotometers 72 and 38 are presented. The agreement between the two and the variability of total ozone overburden through the experiment period are discussed.

  9. Non-focusing optics spectrophotometer, and methods of use

    Science.gov (United States)

    Kramer, David M.; Sacksteder, Colette A.

    2004-11-02

    In one aspect, the present invention provides kinetic spectrophotometers that each comprise: (a) a light source; and (b) a compound parabolic concentrator disposed to receive light from the light source and configured to (1) intensify and diffuse the light received from the light source, and (2) direct the intensified and diffused light onto a sample. In other aspects, the present invention provides methods for measuring a photosynthetic parameter, the methods comprising the steps of: (a) illuminating a plant leaf until steady-state photosynthesis is achieved; (b) subjecting the illuminated plant leaf to a period of darkness; (c) using a kinetic spectrophotometer of the invention to collect spectral data from the plant leaf treated in accordance with steps (a) and (b); and (d) determining a value for a photosynthetic parameter from the spectral data.

  10. Performance assessment of Vita Easy Shade spectrophotometer on colour measurement of aesthetic dental materials.

    Science.gov (United States)

    AlGhazali, N; Burnside, G; Smith, R W; Preston, A J; Jarad, F D

    2011-12-01

    Four different shades were used to produce 20 samples of resin-based composite and 20 samples of porcelain to evaluate the performance ability of an intra oral test spectrophotometer compared to a reference spectrophotometer. The absolute colour coordinates CIELAB values measured with both spectrophotometers were significantly different (p spectrophotometers (p < 0.05). Therefore, the Easy Shade can be used in dental practice and dental research with some limitations.

  11. Spectrophotometer-Integrating-Sphere System for Computing Solar Absorptance

    Science.gov (United States)

    Witte, William G., Jr.; Slemp, Wayne S.; Perry, John E., Jr.

    1991-01-01

    A commercially available ultraviolet, visible, near-infrared spectrophotometer was modified to utilize an 8-inch-diameter modified Edwards-type integrated sphere. Software was written so that the reflectance spectra could be used to obtain solar absorptance values of 1-inch-diameter specimens. A descriptions of the system, spectral reflectance, and software for calculation of solar absorptance from reflectance data are presented.

  12. Electrostatic Precipitator (ESP) TRAINING MANUAL

    Science.gov (United States)

    The manual assists engineers in using a computer program, the ESPVI 4.0W, that models all elements of an electrostatic precipitator (ESP). The program is a product of the Electric Power Research Institute and runs in the Windows environment. Once an ESP is accurately modeled, the...

  13. Mars Thermospheric Temperature Sensitivity to Solar EUV Forcing from the MAVEN EUV Monitor

    Science.gov (United States)

    Thiemann, Ed; Eparvier, Francis; Andersson, Laila; Pilinski, Marcin; Chamberlin, Phillip; Fowler, Christopher; MAVEN Extreme Ultraviolet Monitor Team, MAVEN Langmuir Probe and Waves Team

    2017-10-01

    Solar extreme ultraviolet (EUV) radiation is the primary heat source for the Mars thermosphere, and the primary source of long-term temperature variability. The Mars obliquity, dust cycle, tides and waves also drive thermospheric temperature variability; and it is important to quantify the role of each in order to understand processes in the upper atmosphere today and, ultimately, the evolution of Mars climate over time. Although EUV radiation is the dominant heating mechanism, accurately measuring the thermospheric temperature sensitivity to EUV forcing has remained elusive, in part, because Mars thermospheric temperature varies dramatically with latitude and local time (LT), ranging from 150K on the nightside to 300K on the dayside. It follows that studies of thermospheric variability must control for location.Instruments onboard the Mars Atmosphere and Volatile EvolutioN (MAVEN) orbiter have begun to characterize thermospheric temperature sensitivity to EUV forcing. Bougher et al. [2017] used measurements from the Imaging Ultraviolet Spectrograph (IUVS) and the Neutral Gas and Ion Mass Spectrometer (NGIMS) to characterize solar activity trends in the thermosphere with some success. However, aside from restricting measurements to solar zenith angles (SZAs) below 75 degrees, they were unable to control for latitude and LT because repeat-track observations from either instrument were limited or unavailable.The MAVEN EUV Monitor (EUVM) has recently demonstrated the capability to measure thermospheric density from 100 to 200 km with solar occultations of its 17-22 nm channel. These new density measurements are ideal for tracking the long-term thermospheric temperature variability because they are inherently constrained to either 06:00 or 18:00 LT, and the orbit has precessed to include a range of ecliptic latitudes, a number of which have been revisited multiple times over 2.5 years. In this study we present, for the first-time, measurements of thermospheric

  14. [Design of a portable UV-Vis spectrophotometer].

    Science.gov (United States)

    Wan, Feng; Sun, Hong-wei; Fan, Shi-fu

    2006-04-01

    In the present paper, a method for how to design a portable UV-Vis spectrophotometer is introduced. The Hamamatsu multichannel detector S3904-1024Q and a flat field concave grating are employed to design a miniaturized dispersion system. In order to solve the contradiction between the spectral width and energy-utilizing ratio of the light source, a multi-band optical fiber is employed, one side of which is arranged to be rectangle as the entrance slit. The touch screen is employed as the input and output system of the spectrophotometer, and the miniaturized fiber-optic UV-Vis light source is employed as the light source. The research results and testing results of the prototype show that the new spectrophotometer based on the authors' new method is of miniaturization in volume(190 mm x 170 mm x 100 mm), can realize multi-wavelength-detection on-line, and is easily handled (touch screen control), and its performance accords with the Chinese national standard.

  15. Surface roughness control by extreme ultraviolet (EUV) radiation

    Science.gov (United States)

    Ahad, Inam Ul; Obeidi, Muhannad Ahmed; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Brabazon, Dermot

    2017-10-01

    Surface roughness control of polymeric materials is often desirable in various biomedical engineering applications related to biocompatibility control, separation science and surface wettability control. In this study, Polyethylene terephthalate (PET) polymer films were irradiated with Extreme ultraviolet (EUV) photons in nitrogen environment and investigations were performed on surface roughness modification via EUV exposure. The samples were irradiated at 3 mm and 4 mm distance from the focal spot to investigate the effect of EUV fluence on topography. The topography of the EUV treated PET samples were studied by AFM. The detailed scanning was also performed on the sample irradiated at 3 mm. It was observed that the average surface roughness of PET samples was increased from 9 nm (pristine sample) to 280 nm and 253 nm for EUV irradiated samples. Detailed AFM studies confirmed the presence of 1.8 mm wide period U-shaped channels in EUV exposed PET samples. The walls of the channels were having FWHM of about 0.4 mm. The channels were created due to translatory movements of the sample in horizontal and transverse directions during the EUV exposure. The increased surface roughness is useful for many applications. The nanoscale channels fabricated by EUV exposure could be interesting for microfluidic applications based on lab-on-a-chip (LOC) devices.

  16. 21 CFR 862.2850 - Atomic absorption spectrophotometer for clinical use.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Atomic absorption spectrophotometer for clinical... Laboratory Instruments § 862.2850 Atomic absorption spectrophotometer for clinical use. (a) Identification. An atomic absorption spectrophotometer for clinical use is a device intended to identify and measure...

  17. 21 CFR 862.2300 - Colorimeter, photometer, or spectrophotometer for clinical use.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Colorimeter, photometer, or spectrophotometer for... Clinical Laboratory Instruments § 862.2300 Colorimeter, photometer, or spectrophotometer for clinical use. (a) Identification. A colorimeter, a photometer, or a spectrophotometer for clinical use is an...

  18. A swirling flare-related EUV jet

    Science.gov (United States)

    Zhang, Q. M.; Ji, H. S.

    2014-01-01

    Aims: We report our observations of a swirling flare-related extreme-ultraviolet (EUV) jet on 2011 October 15 at the edge of NOAA active region 11314. Methods: We used the multiwavelength observations in the EUV passbands from the Atmospheric Imaging Assembly (AIA) aboard the Solar Dynamics Observatory (SDO). We extracted a wide slit along the jet axis and 12 thin slits across its axis to investigate the longitudinal motion and transverse rotation. We also used data from the Extreme-Ultraviolet Imager (EUVI) aboard the Solar TErrestrial RElations Observatory (STEREO) spacecraft to investigate the three-dimensional (3D) structure of the jet. Ground-based Hα images from the El Teide Observatory, a member of the Global Oscillation Network Group (GONG), provide a good opportunity to explore the relationship between the cool surge and the hot jet. Line-of-sight magnetograms from the Helioseismic and Magnetic Imager (HMI) aboard SDO enable us to study the magnetic evolution of the flare/jet event. We carried out potential-field extrapolation to calculate the magnetic configuration associated with the jet. Results: The onset of jet eruption coincided with the start time of the C1.6 flare impulsive phase. The initial velocity and acceleration of the longitudinal motion were 254 ± 10 km s-1 and -97 ± 5 m s-2, respectively. The jet presented helical structure and transverse swirling motion at the beginning of its eruption. The counter-clockwise rotation slowed down from an average velocity of ~122 km s-1 to ~80 km s-1. The interwinding thick threads of the jet untwisted into multiple thin threads during the rotation that lasted for one cycle with a period of ~7 min and an amplitude that increases from ~3.2 Mm at the bottom to ~11 Mm at the upper part. Afterwards, the curtain-like leading edge of the jet continued rising without rotation, leaving a dimming region behind, before falling back to the solar surface. The appearance/disappearance of dimming corresponded to the

  19. EUV mask manufacturing readiness in the merchant mask industry

    Science.gov (United States)

    Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

    2017-10-01

    As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for

  20. Combining ESP and baghouse technology

    Energy Technology Data Exchange (ETDEWEB)

    Rowland, B.; Ganatra, C.P.; Woolston, J. [W.L. Gore & Associates, Inc., Elkton, MD (United States)

    1994-12-31

    The authors present a progressive application in the field of air pollution control technology. The content of this paper should appeal to operators who must operate out-of-compliance electrostatic precipitators (ESPs), or to those who strive for optimal emission control. St. Lawrence Cement Company, a plant in Beauport Canada, has been in operation since 1955. Their two wet process kilns have utilized electrostatic precipitator (ESP) filters since inception. Since 1965, this company has strived to reduce energy consumption by using alternative waste fuel. This, combined with the increased demand of low alkali cement, took its toll on the ESPs, causing the equipment and its performance to deteriorate. Pressure from environmental agencies to lower outlet emissions forced the company to consider ESP modifications. After investigating several alternatives, the optimal modification was to combine the ESP with bag filters. In addition to being the best choice from a performance standpoint, it was also the least expensive. This modification also allowed a reduced alkali dust from the ESP hoppers to be recirculated to the kilns. The latter two-thirds of the ESP were converted to a baghouse, and optimal system performance was achieved by using high efficiency expanded polytetrafluoroethylene (ePTFE) membrane filter bags. Despite the high moisture, submicron particle size, and cohesive nature of the alkaline dust, very low pressure differentials and extremely low emissions were achieved. Most notably, this complex project was completed within nine months, from concept to commissioning. The plant was shut down for only six weeks during the entire retrofit process. This economically attractive idea was readily accepted by St. Lawrence Cement personnel and the permitting agencies. After the first successful kiln/ESP retrofit, the second kiln/ESP conversion was completed the following year.

  1. Impact of EUV SRAF on Bossung tilt

    Science.gov (United States)

    Wang, Yow-Gwo; Hsu, Stephen; Socha, Robert; Neureuther, Andy; Naulleau, Patrick

    2017-03-01

    Mask 3D (M3D) effects remain a significant challenge affecting EUV lithography (EUVL) imaging performance due to the comparable sizes of the mask and the EUV wavelength. Pre-compensation with the insertion of sub-resolution assist features (SRAFs) has been proposed as a solution to compensate M3D effects and improve the process window for advanced technology nodes. In this paper, we discuss the possible positive impact of SRAFs on Bossung tilt, and provide physical insight into the optical mechanisms at play enabling M3D effect mitigation. In particular, we consider an example isolated 2-bar (CD = 16 nm) pattern imaged under delta function dipole illumination. We compare the scattered order distribution and Bossung tilt with and without SRAFs. The results show that SRAFs actually introduce stronger effective single pole aberrations in the imaging process. However, the opposite impacts on Bossung tilt from each pole results in an overall improvement for dipole illumination. Reduced Bossung tilt and a 21% improvement of the overlapping process window are achieved by the insertion of asymmetric SRAFs into the 2-bar mask design.

  2. Electron beam inspection of 16nm HP node EUV masks

    Science.gov (United States)

    Shimomura, Takeya; Narukawa, Shogo; Abe, Tsukasa; Takikawa, Tadahiko; Hayashi, Naoya; Wang, Fei; Ma, Long; Lin, Chia-Wen; Zhao, Yan; Kuan, Chiyan; Jau, Jack

    2012-11-01

    EUV lithography (EUVL) is the most promising solution for 16nm HP node semiconductor device manufacturing and beyond. The fabrication of defect free EUV mask is one of the most challenging roadblocks to insert EUVL into high volume manufacturing (HVM). To fabricate and assure the defect free EUV masks, electron beam inspection (EBI) tool will be likely the necessary tool since optical mask inspection systems using 193nm and 199nm light are reaching a practical resolution limit around 16nm HP node EUV mask. For production use of EBI, several challenges and potential issues are expected. Firstly, required defect detection sensitivity is quite high. According to ITRS roadmap updated in 2011, the smallest defect size needed to detect is about 18nm for 15nm NAND Flash HP node EUV mask. Secondly, small pixel size is likely required to obtain the high sensitivity. Thus, it might damage Ru capped Mo/Si multilayer due to accumulated high density electron beam bombardments. It also has potential of elevation of nuisance defects and reduction of throughput. These challenges must be solved before inserting EBI system into EUV mask HVM line. In this paper, we share our initial inspection results for 16nm HP node EUV mask (64nm HP absorber pattern on the EUV mask) using an EBI system eXplore® 5400 developed by Hermes Microvision, Inc. (HMI). In particularly, defect detection sensitivity, inspectability and damage to EUV mask were assessed. As conclusions, we found that the EBI system has capability to capture 16nm defects on 64nm absorber pattern EUV mask, satisfying the sensitivity requirement of 15nm NAND Flash HP node EUV mask. Furthermore, we confirmed there is no significant damage to susceptible Ru capped Mo/Si multilayer. We also identified that low throughput and high nuisance defect rate are critical challenges needed to address for the 16nm HP node EUV mask inspection. The high nuisance defect rate could be generated by poor LWR and stitching errors during EB writing

  3. [In vivo model to evaluate the accuracy of complete-tooth spectrophotometer for dental clinics].

    Science.gov (United States)

    Liu, Feng; Yang, Jian; Xu, Tong-Kai; Xu, Ming-Ming; Ma, Yu

    2011-02-01

    To test ΔE between measured value and right value from the Crystaleye complete-tooth spectrophotometer, and to evaluate the accuracy rate of the spectrophotometer. Twenty prosthodontists participated in the study. Each of them used Vita 3D-Master shadeguide to do the shade matching, and used Crystaleye complete-tooth spectrophotometer (before and after the test training) tested the middle of eight fixed tabs from shadeguide in the dark box. The results of shade matching and spectrophotometer were recorded. The accuracy rate of shade matching and the spectrophotometer before and after training were calculated. The average accuracy rate of shade matching was 49%. The average accuracy rate of the spectrophotometer before and after training was 83% and 99%. The accuracy of the spectrophotometer was significant higher than that in shade matching, and training can improve the accuracy rate.

  4. EUV laser produced and induced plasmas for nanolithography

    Science.gov (United States)

    Sizyuk, Tatyana; Hassanein, Ahmed

    2017-10-01

    EUV produced plasma sources are being extensively studied for the development of new technology for computer chips production. Challenging tasks include optimization of EUV source efficiency, producing powerful source in 2 percentage bandwidth around 13.5 nm for high volume manufacture (HVM), and increasing the lifetime of collecting optics. Mass-limited targets, such as small droplet, allow to reduce contamination of chamber environment and mirror surface damage. However, reducing droplet size limits EUV power output. Our analysis showed the requirement for the target parameters and chamber conditions to achieve 500 W EUV output for HVM. The HEIGHTS package was used for the simulations of laser produced plasma evolution starting from laser interaction with solid target, development and expansion of vapor/plasma plume with accurate optical data calculation, especially in narrow EUV region. Detailed 3D modeling of mix environment including evolution and interplay of plasma produced by lasers from Sn target and plasma produced by in-band and out-of-band EUV radiation in ambient gas, used for the collecting optics protection and cleaning, allowed predicting conditions in entire LPP system. Effect of these conditions on EUV photon absorption and collection was analyzed. This work is supported by the National Science Foundation, PIRE project.

  5. Ultraviolet spectrophotometer for measuring columnar atmospheric ozone from aircraft

    Science.gov (United States)

    Hanser, F. A.; Sellers, B.; Briehl, D. C.

    1978-01-01

    An ultraviolet spectrophotometer (UVS) to measure downward solar fluxes from an aircraft or other high altitude platform is described. The UVS uses an ultraviolet diffuser to obtain large angular response with no aiming requirement, a twelve-position filter wheel with narrow (2-nm) and broad (20-nm) bandpass filters, and an ultraviolet photodiode. The columnar atmospheric ozone above the UVS (aircraft) is calculated from the ratios of the measured ultraviolet fluxes. Comparison with some Dobson station measurements gives agreement to 2%. Some UVS measured ozone profiles over the Pacific Ocean for November 1976 are shown to illustrate the instrument's performance.

  6. Simple LED spectrophotometer for analysis of color information.

    Science.gov (United States)

    Kim, Ji-Sun; Kim, A-Hee; Oh, Han-Byeol; Goh, Bong-Jun; Lee, Eun-Suk; Kim, Jun-Sik; Jung, Gu-In; Baek, Jin-Young; Jun, Jae-Hoon

    2015-01-01

    A spectrophotometer is the basic measuring equipment essential to most research activity fields requiring samples to be measured, such as physics, biotechnology and food engineering. This paper proposes a system that is able to detect sample concentration and color information by using LED and color sensor. Purity and wavelength information can be detected by CIE diagram, and the concentration can be estimated with purity information. This method is more economical and efficient than existing spectrophotometry, and can also be used by ordinary persons. This contribution is applicable to a number of fields because it can be used as a colorimeter to detect the wavelength and purity of samples.

  7. Free-electron laser emission architecture impact on EUV lithography

    Science.gov (United States)

    Hosler, Erik R.; Wood, Obert R.; Barletta, William A.

    2017-03-01

    Laser-produced plasma (LPP) EUV sources have demonstrated approximately 125 W at customer sites, establishing confidence in EUV lithography as a viable manufacturing technology. However, beyond the 7 nm technology node existing scanner/source technology must enable higher-NA imaging systems (requiring increased resist dose and providing half-field exposures) and/or EUV multi-patterning (requiring increased wafer throughput proportional to the number of exposure passes. Both development paths will require a substantial increase in EUV source power to maintain the economic viability of the technology, creating an opportunity for free-electron laser (FEL) EUV sources. FEL-based EUV sources offer an economic, high-power/single-source alternative to LPP EUV sources. Should free-electron lasers become the preferred next generation EUV source, the choice of FEL emission architecture will greatly affect its operational stability and overall capability. A near-term industrialized FEL is expected to utilize one of the following three existing emission architectures: (1) selfamplified spontaneous emission (SASE), (2) regenerative amplification (RAFEL), or (3) self-seeding (SS-FEL). Model accelerator parameters are put forward to evaluate the impact of emission architecture on FEL output. Then, variations in the parameter space are applied to assess the potential impact to lithography operations, thereby establishing component sensitivity. The operating range of various accelerator components is discussed based on current accelerator performance demonstrated at various scientific user facilities. Finally, comparison of the performance between the model accelerator parameters and the variation in parameter space provides a means to evaluate the potential emission architectures. A scorecard is presented to facilitate this evaluation and provide a framework for future FEL design and enablement for EUV lithography applications.

  8. Mrk421: EUVE observations from 1994 to 1997

    OpenAIRE

    Cagnoni, Ilaria; Fruscione, Antonella; Papadakis, Iossif E.

    1998-01-01

    We present spectral and timing analysis of all the data collected by the Extreme Ultraviolet Explorer for the BL Lac object Mrk 421 from 1994 to 1997. During these years Mrk 421 has been observed by EUVE 4 times with the DS/Spectrograph and 2 times with the imaging telescopes for a total of ~1.4 millions seconds. The total EUVE light curve seems to be smoothly varying on the long time-scale while on a shorter time-scale there is evidence of an EUVE flare correlated to the 1995 TeV flare. We a...

  9. Development of a novel closed EUV pellicle for EUVL manufacturing

    Science.gov (United States)

    Ono, Yosuke; Kohmura, Kazuo; Okubo, Atsushi; Taneichi, Daiki; Ishikawa, Hisako; Biyajima, Tsuneaki

    2016-09-01

    As for the EUV pellicle, closed pellicle structure with the filters which has fundamentally no penetration path of particles is needed to keep the clean reliability level of photomask equivalent to the current photolithography. We proposed a novel closed EUV pellicle equipped with filters which has not only the particle intrusion prevention but also the ventilation performance. Full-size closed EUV pellicle was fabricated by forming the vent holes in the Si border part and putting the wide filters on the top side of Si border. As the result, we experimentally confirmed the suppression of the membrane deflection under the practical pumping down condition.

  10. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

    Directory of Open Access Journals (Sweden)

    Junichi Fujimoto

    2012-01-01

    Full Text Available Since 2002, we have been developing a carbon dioxide (CO2 laser-produced tin (Sn plasma (LPP extreme ultraviolet (EUV light source, which is the most promising solution because of the 13.5 nm wavelength high power (>200 W light source for high volume manufacturing. EUV lithography is used for its high efficiency, power scalability, and spatial freedom around plasma. We believe that the LPP scheme is the most feasible candidate for the EUV light source for industrial use. We have several engineering data from our test tools, which include 93% Sn ionization rate, 98% Sn debris mitigation by a magnetic field, and 68% CO2 laser energy absorption rate. The way of dispersion of Sn by prepulse laser is key to improve conversion efficiency (CE. We focus on prepulsed laser pulsed duration. When we have optimized pulse duration from nanosecond to picosecond, we have obtained maximum 4.7% CE (CO2 laser to EUV; our previous data was 3.8% at 2 mJ EUV pulse energy. Based on these data we are developing our first light source as our product: “GL200E.” The latest data and the overview of EUV light source for the industrial EUV lithography are reviewed in this paper.

  11. Shedding light on spectrophotometry: The SpecUP educational spectrophotometer

    Directory of Open Access Journals (Sweden)

    Patricia B.C. Forbes

    2014-02-01

    Full Text Available Students often regard laboratory instruments as black boxes which generate results, without understanding their principles of operation. This lack of understanding is a concern because the correct interpretation of analytical results and the limitations thereof is invariably based on an understanding of the mechanism of measurement. Moreover, a number of tertiary institutions in Africa have very limited resources and access to laboratory equipment, including that related to the field of photonics, which prevents students from acquiring hands-on practical experience. We address both of these challenges by describing how students can assemble a novel, low-cost spectrophotometer, called the SpecUP, which can then be used in a range of experiments. The same kind of information can be generated as that obtained with costly commercial spectrophotometers (albeit of a lower quality. With the SpecUP, students also have the opportunity to vary instrumental parameters and to observe the effects these changes have on their experimental results, allowing for enquiry-based learning of spectroscopic principles. The results obtained for some chemistry-related spectrophotometric experiments are described for each of the two operational modes of the SpecUP, although the instrument can be applied in fields ranging from physics to biochemistry

  12. Microcontroller based spectrophotometer using compact disc as diffraction grid

    Science.gov (United States)

    Bano, Saleha; Altaf, Talat; Akbar, Sunila

    2010-12-01

    This paper describes the design and implementation of a portable, inexpensive and cost effective spectrophotometer. The device combines the use of compact disc (CD) media as diffraction grid and 60 watt bulb as a light source. Moreover it employs a moving slit along with stepper motor for obtaining a monochromatic light, photocell with spectral sensitivity in visible region to determine the intensity of light and an amplifier with a very high gain as well as an advanced virtual RISC (AVR) microcontroller ATmega32 as a control unit. The device was successfully applied to determine the absorbance and transmittance of KMnO4 and the unknown concentration of KMnO4 with the help of calibration curve. For comparison purpose a commercial spectrophotometer was used. There are not significant differences between the absorbance and transmittance values estimated by the two instruments. Furthermore, good results are obtained at all visible wavelengths of light. Therefore, the designed instrument offers an economically feasible alternative for spectrophotometric sample analysis in small routine, research and teaching laboratories, because the components used in the designing of the device are cheap and of easy acquisition.

  13. Portable visible and near-infrared spectrophotometer for triglyceride measurements.

    Science.gov (United States)

    Kobayashi, Takanori; Kato, Yukiko Hakariya; Tsukamoto, Megumi; Ikuta, Kazuyoshi; Sakudo, Akikazu

    2009-01-01

    An affordable and portable machine is required for the practical use of visible and near-infrared (Vis-NIR) spectroscopy. A portable fruit tester comprising a Vis-NIR spectrophotometer was modified for use in the transmittance mode and employed to quantify triglyceride levels in serum in combination with a chemometric analysis. Transmittance spectra collected in the 600- to 1100-nm region were subjected to a partial least-squares regression analysis and leave-out cross-validation to develop a chemometrics model for predicting triglyceride concentrations in serum. The model yielded a coefficient of determination in cross-validation (R2VAL) of 0.7831 with a standard error of cross-validation (SECV) of 43.68 mg/dl. The detection limit of the model was 148.79 mg/dl. Furthermore, masked samples predicted by the model yielded a coefficient of determination in prediction (R2PRED) of 0.6856 with a standard error of prediction (SEP) and detection limit of 61.54 and 159.38 mg/dl, respectively. The portable Vis-NIR spectrophotometer may prove convenient for the measurement of triglyceride concentrations in serum, although before practical use there remain obstacles, which are discussed.

  14. Characterization of highly transient EUV emitting discharges

    Energy Technology Data Exchange (ETDEWEB)

    Mullen, Joost van der; Kieft, Erik; Broks, Bart [Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven (Netherlands)

    2006-07-15

    The method of disturbed Bilateral Relations (dBR) is used to characterize highly transient plasmas that are used for the generation of Extreme Ultra Violet (EUV), i.e. radiation with a wavelength around 13.5 nm. This dBR method relates equilibrium disturbing to equilibrium restoring processes and follows the degree of equilibrium departure from the global down to the elementary plasma-level. The study gives global values of the electron density and electron temperature. Moreover, it gives a method to construct the atomic state distribution function (ASDF). This ASDF, which is responsible for the spectrum generated by the discharge, is found to be far from equilibrium. There are two reasons for this: first, systems with high charge numbers radiate strongly, second the highly transient behaviour makes that the distribution over the various ionization stages lags behind the temperature evolution.

  15. Critical challenges for EUV resist materials

    Energy Technology Data Exchange (ETDEWEB)

    Naulleau, Patrick P.; Anderson, Christopher N.; Baclea-an, Lorie-Mae; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Jones, Gideon; McClinton, Brittany; Miyakawa, Ryan; Rekawa, Seno; Smith, Nathan

    2011-02-28

    Although Extreme ultraviolet lithography (EUVL) is now well into the commercialization phase, critical challenges remain in the development of EUV resist materials. The major issue for the 22-nm half-pitch node remains simultaneously meeting resolution, line-edge roughness (LER), and sensitivity requirements. Although several materials have met the resolution requirements, LER and sensitivity remain a challenge. As we move beyond the 22-nm node, however, even resolution remains a significant challenge. Chemically amplified resists have yet to demonstrate the required resolution at any speed or LER for 16-nm half pitch and below. Going to non-chemically amplified resists, however, 16-nm resolution has been achieved with a LER of 2 nm but a sensitivity of only 70 mJ/cm{sup 2}.

  16. Gadolinium EUV Multilayers for Solar Imaging Near 60 nm Project

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose to develop and commercialize a new class of extreme ultraviolet (EUV) multilayer coatings containing the rare-earth element gadolinium (Gd), designed as...

  17. AlN Based Extreme Ultraviolet (EUV) Detectors Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This Phase I project is to investigate the feasibility for achieving EUV detectors for space applications by exploiting the ultrahigh bandgap semiconductor - AlN. We...

  18. Film quantum yields of EUV& ultra-high PAG photoresists

    Energy Technology Data Exchange (ETDEWEB)

    Hassanein, Elsayed; Higgins, Craig; Naulleau, Patrick; Matyi, Richard; Gallatin, Greg; Denbeaux, Gregory; Antohe, Alin; Thackery, Jim; Spear, Kathleen; Szmanda, Charles; Anderson, Christopher N.; Niakoula, Dimitra; Malloy, Matthew; Khurshid, Anwar; Montgomery, Cecilia; Piscani, Emil C.; Rudack, Andrew; Byers, Jeff; Ma, Andy; Dean, Kim; Brainard, Robert

    2008-01-10

    Base titration methods are used to determine C-parameters for three industrial EUV photoresist platforms (EUV-2D, MET-2D, XP5496) and twenty academic EUV photoresist platforms. X-ray reflectometry is used to measure the density of these resists, and leads to the determination of absorbance and film quantum yields (FQY). Ultrahigh levels ofPAG show divergent mechanisms for production of photo acids beyond PAG concentrations of 0.35 moles/liter. The FQY of sulfonium PAGs level off, whereas resists prepared with iodonium PAG show FQY s that increase beyond PAG concentrations of 0.35 moles/liter, reaching record highs of 8-13 acids generatedlEUV photons absorbed.

  19. Design requirements for a stand alone EUV interferometer

    Science.gov (United States)

    Michallon, Ph.; Constancias, C.; Lagrange, A.; Dalzotto, B.

    2008-03-01

    EUV lithography is expected to be inserted for the 32/22 nm nodes with possible extension below. EUV resist availability remains one of the main issues to be resolved. There is an urgent need to provide suitable tools to accelerate resist development and to achieve resolution, LER and sensitivity specifications simultaneously. An interferometer lithography tool offers advantages regarding conventional EUV exposure tool. It allows the evaluation of resists, free from the deficiencies of optics and mask which are limiting the achieved resolution. Traditionally, a dedicated beam line from a synchrotron, with limited access, is used as a light source in EUV interference lithography. This paper identifies the technology locks to develop a stand alone EUV interferometer using a compact EUV source. It will describe the theoretical solutions adopted and especially look at the feasibility according to available technologies. EUV sources available on the market have been evaluated in terms of power level, source size, spatial coherency, dose uniformity, accuracy, stability and reproducibility. According to the EUV source characteristics, several optic designs were studied (simple or double gratings). For each of these solutions, the source and collimation optic specifications have been determined. To reduce the exposure time, a new grating technology will also be presented allowing to significantly increasing the transmission system efficiency. The optical grating designs were studied to allow multi-pitch resolution print on the same exposure without any focus adjustment. Finally micro mechanical system supporting the gratings was studied integrating the issues due to vacuum environment, alignment capability, motion precision, automation and metrology to ensure the needed placement control between gratings and wafer. A similar study was carried out for the collimation-optics mechanical support which depends on the source characteristics.

  20. Optical and EUV light curves of dwarf nova outbursts

    Energy Technology Data Exchange (ETDEWEB)

    Mauche, C W; Mattei, J A; Bateson, F M

    2000-11-15

    We combine AAVSO and VSS/RASNZ optical and Extreme Ultraviolet Explorer EUV light curves of dwarf novae in outburst to place constraints on the nature of dwarf nova outbursts. From the observed optical-EUV time delays of {approx} 0.75-1.5 days, we show that the propagation velocity of the dwarf nova instability heating wave is {approx} 3 km s{sup -1}.

  1. [A micro-silicon multi-slit spectrophotometer based on MEMS technology].

    Science.gov (United States)

    Hao, Peng; Wu, Yi-Hui; Zhang, Ping; Liu, Yong-Shun; Zhang, Ke; Li, Hai-Wen

    2009-06-01

    A new mini-spectrophotometer was developed by adopting micro-silicon slit and pixel segmentation technology, and this spectrophotometer used photoelectron diode array as the detector by the back-dividing-light way. At first, the effect of the spectral bandwidth on the tested absorbance linear correlation was analyzed. A theory for the design of spectrophotometer's slit was brought forward after discussing the relationships between spectrophotometer spectrum band width and pre-and post-slits width. Then, the integrative micro-silicon-slit, which features small volume, high precision, and thin thickness, was manufactured based on the MEMS technology. Finally, a test was carried on linear absorbance solution by this spectrophotometer. The final result showed that the correlation coefficients were larger than 0.999, which means that the new mini-spectrophotometer with micro-silicon slit pixel segmentation has an obvious linear correlation.

  2. Consequences of high-frequency operation on EUV source efficiency

    Science.gov (United States)

    Sizyuk, Tatyana

    2017-08-01

    A potential problem of future extreme ultraviolet (EUV) sources, required for high volume manufacture regimes, can be related to the contamination of the chamber environment by products of preceding laser pulse/droplet interactions. Implementation of high, 100 kHz and higher, repetition rate of EUV sources using Sn droplets ignited with laser pulses can cause high accumulation of tin in the chamber in the form of vapor, fine mist, or fragmented clusters. In this work, the effects of the residual tin accumulation in the EUV chamber in dependence on laser parameters and mitigation system efficiency were studied. The effect of various pressures of tin vapor on the CO2 and Nd:YAG laser beam propagation and on the size, the intensity, and the resulting efficiency of the EUV sources was analyzed. The HEIGHTS 3D package was used for this analysis to study the effect of residual background pressure and spatial distribution on EUV photon emission and collection. It was found that background pressure in the range of 1-5 Pa does not significantly influence the EUV source produced by CO2 lasers. A larger volume with this pressure condition, however, can reduce the efficiency of the source. However, an optimized volume of mix with proper density could increase the efficiency of the sources produced by CO2 lasers.

  3. Classification and printability of EUV mask defects from SEM images

    Science.gov (United States)

    Cho, Wonil; Price, Daniel; Morgan, Paul A.; Rost, Daniel; Satake, Masaki; Tolani, Vikram L.

    2017-10-01

    Classification and Printability of EUV Mask Defects from SEM images EUV lithography is starting to show more promise for patterning some critical layers at 5nm technology node and beyond. However, there still are many key technical obstacles to overcome before bringing EUV Lithography into high volume manufacturing (HVM). One of the greatest obstacles is manufacturing defect-free masks. For pattern defect inspections in the mask-shop, cutting-edge 193nm optical inspection tools have been used so far due to lacking any e-beam mask inspection (EBMI) or EUV actinic pattern inspection (API) tools. The main issue with current 193nm inspection tools is the limited resolution for mask dimensions targeted for EUV patterning. The theoretical resolution limit for 193nm mask inspection tools is about 60nm HP on masks, which means that main feature sizes on EUV masks will be well beyond the practical resolution of 193nm inspection tools. Nevertheless, 193nm inspection tools with various illumination conditions that maximize defect sensitivity and/or main-pattern modulation are being explored for initial EUV defect detection. Due to the generally low signal-to-noise in the 193nm inspection imaging at EUV patterning dimensions, these inspections often result in hundreds and thousands of defects which then need to be accurately reviewed and dispositioned. Manually reviewing each defect is difficult due to poor resolution. In addition, the lack of a reliable aerial dispositioning system makes it very challenging to disposition for printability. In this paper, we present the use of SEM images of EUV masks for higher resolution review and disposition of defects. In this approach, most of the defects detected by the 193nm inspection tools are first imaged on a mask SEM tool. These images together with the corresponding post-OPC design clips are provided to KLA-Tencor's Reticle Decision Center (RDC) platform which provides ADC (Automated Defect Classification) and S2A (SEM

  4. Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes

    CERN Document Server

    Dolgov, A; Abrikosov, A; Snegirev, E; Krivtsun, V M; Lee, C J; Bijkerk, F

    2014-01-01

    An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.

  5. Estimation of total alkaloid in Chitrakadivati by UV-Spectrophotometer.

    Science.gov (United States)

    Ajanal, Manjunath; Gundkalle, Mahadev B; Nayak, Shradda U

    2012-04-01

    Herbal formulation standardization by adopting newer technique is need of the hour in the field of Ayurvedic pharmaceutical industry. As very few reports exist. These kind of studies would certainly widen the herbal research area. Chitrakadivati is one such popular herbal formulation used in Ayurveda. Many of its ingredients are known for presence of alkaloids. Presence of alkaloid was tested qualitatively by Dragondroff's method then subjected to quantitative estimation by UV-Spectrophotometer. This method is based on the reaction between alkaloid and bromocresol green (BCG). Study discloses that out of 16 ingredients, 9 contain alkaloid. Chitrakadivati has shown 0.16% of concentration of alkaloid and which is significantly higher than it's individual ingredients.

  6. Early results from the Far Infrared Absolute Spectrophotometer (FIRAS)

    Science.gov (United States)

    Mather, J. C.; Cheng, E. S.; Shafer, R. A.; Eplee, R. E.; Isaacman, R. B.; Fixsen, D. J.; Read, S. M.; Meyer, S. S.; Weiss, R.; Wright, E. L.

    1991-01-01

    The Far Infrared Absolute Spectrophotometer (FIRAS) on the Cosmic Background Explorer (COBE) mapped 98 percent of the sky, 60 percent of it twice, before the liquid helium coolant was exhausted. The FIRAS covers the frequency region from 1 to 100/cm with a 7 deg angular resolution. The spectral resolution is 0.2/cm for frequencies less than 20/cm and 0.8/cm for higher frequencies. Preliminary results include: a limit on the deviations from a Planck curve of 1 percent of the peak brightness from 1 to 20/cm, a temperature of 2.735 +/- 0.06 K, a limit on the Comptonization parameter y of 0.001, on the chemical potential parameter mu of 0.01, a strong limit on the existence of a hot smooth intergalactic medium, and a confirmation that the dipole anisotropy spectrum is that of a Doppler shifted blackbody.

  7. RECALIBRATION OF H CANYON ONLINE SPECTROPHOTOMETER AT EXTENDED URANIUM CONCENTRATION

    Energy Technology Data Exchange (ETDEWEB)

    Lascola, R

    2008-10-29

    The H Canyon online spectrophotometers are calibrated for measurement of the uranium and nitric acid concentrations of several tanks in the 2nd Uranium Cycle.[1] The spectrometers, flow cells, and prediction models are currently optimized for a process in which uranium concentrations are expected to range from 0-15 g/L and nitric acid concentrations from 0.05-6 M. However, an upcoming processing campaign will involve 'Super Kukla' material, which has a lower than usual enrichment of fissionable uranium. Total uranium concentrations will be higher, spanning approximately 0-30 g/L U, with no change in the nitric acid concentrations. The new processing conditions require the installation of new flow cells with shorter path lengths. As the process solutions have a higher uranium concentration, the shorter path length is required to decrease the absorptivity to values closer to the optimal range for the instrument. Also, new uranium and nitric acid prediction models are required to span the extended uranium concentration range. The models will be developed for the 17.5 and 15.4 tanks, for which nitric acid concentrations will not exceed 1 M. The restricted acid range compared to the original models is anticipated to reduce the measurement uncertainty for both uranium and nitric acid. The online spectrophotometers in H Canyon Second Uranium Cycle were modified to allow measurement of uranium and nitric acid for the Super Kukla processing campaign. The expected uranium concentrations, which are higher than those that have been recently processed, required new flow cells with one-third the optical path length of the existing cells. Also, new uranium and nitric acid calibrations were made. The estimated reading uncertainties (2{sigma}) for Tanks 15.4 and 17.5 are {approx}5% for uranium and {approx}25% for nitric acid.

  8. Needs Analysis for ESP Programmes.

    Science.gov (United States)

    Roberts, Celia

    1982-01-01

    Discusses the four main tasks involved in designing an appropriate ESP program: (1) preliminary survey, (2) data collection, (3) selection of situations and writing objectives in behavioral terms, (4) syllabus design. Concentrates on the first two, but does give some examples of the last two. (EKN)

  9. Typical errors of ESP users

    Science.gov (United States)

    Eremina, Svetlana V.; Korneva, Anna A.

    2004-07-01

    The paper presents analysis of the errors made by ESP (English for specific purposes) users which have been considered as typical. They occur as a result of misuse of resources of English grammar and tend to resist. Their origin and places of occurrence have also been discussed.

  10. ESP Methodology for Science Lecturers.

    Science.gov (United States)

    Rogers, Angela; Mulyana, Cukup

    A program designed to teach university science lecturers in Indonesia how to design and teach one-semester courses in English for special purposes (ESP) is described. The program provided lecturers with training in language teaching methodology and course design. The piloting of the teacher training course, focusing on physics instruction, is…

  11. The Spectrophotometer II: A Module on the Spectral Properties of Light. Tech Physics Series.

    Science.gov (United States)

    Frank, Nathaniel; And Others

    This module is designed to give the learner an understanding of the nature of light and how its properties are used in the design of spectrophotometers. Problems promote the use of spectrophotometers in qualitative analysis, the optical elements used in a monochromator, and the physical properties of the prism and the diffraction grating. Other…

  12. Matching repeatability and interdevice agreement of 2 intraoral spectrophotometers.

    Science.gov (United States)

    Sarafianou, Aspasia; Kamposiora, Phophi; Papavasiliou, George; Goula, Helen

    2012-03-01

    The visual determination of tooth color with standard shade guides is a subjective method of color communication, depending on variables such as the light source, the operator, and the tooth. The assessment of tooth color may be improved by the use of special devices such as colorimeters or spectrophotometers. However, the repeatability and the interdevice agreement of these devices have not been thoroughly investigated. The purpose of this study was to evaluate the effect of different illuminants (natural daylight, dental unit lamp, and daylight lamp) on the matching repeatability of 2 intraoral spectrophotometers (Easyshade and SpectroShade). The maxillary right central incisor and canine and the mandibular left central incisor of each of 10 dental students were measured by a single operator using both devices. The color of each tooth was assessed 3 times with each device under each of the 3 different illuminants (natural daylight, a dental unit lamp, and a daylight lamp). The device readings were expressed in Vitapan 3D-Master shade codes. Statistical analysis was performed and the level of agreement was assessed with the Spearman Correlation Coefficient. A particularly high to moderate level of agreement among the readings made under natural daylight, a dental unit lamp, and a daylight lamp was observed for both devices (P<.01), suggesting that their matching repeatability was not completely satisfactory for clinical practice. A moderate and a moderate to high level of agreement was found among Easyshade readings when the 3 different illuminants were used. The level of agreement for the respective SpectroShade readings was particularly high to high (P<.001). A particularly low level of agreement was found among the respective Easyshade and SpectroShade readings performed under any of the illuminants tested (P<.05), suggesting poor interdevice reliability. The matching repeatability of both devices under natural daylight, a dental unit lamp, and a daylight lamp

  13. EUV lithography at the 22nm technology node

    Science.gov (United States)

    Wood, Obert; Koay, Chiew-Seng; Petrillo, Karen; Mizuno, Hiroyuki; Raghunathan, Sudhar; Arnold, John; Horak, Dave; Burkhardt, Martin; McIntyre, Gregory; Deng, Yunfei; La Fontaine, Bruno; Okoroanyanwu, Uzo; Wallow, Tom; Landie, Guillaume; Standaert, Theodorus; Burns, Sean; Waskiewicz, Christopher; Kawasaki, Hirohisa; Chen, James H.-C.; Colburn, Matthew; Haran, Bala; Fan, Susan S.-C.; Yin, Yunpeng; Holfeld, Christian; Techel, Jens; Peters, Jan-Hendrik; Bouten, Sander; Lee, Brian; Pierson, Bill; Kessels, Bart; Routh, Robert; Cummings, Kevin

    2010-04-01

    We are evaluating the readiness of extreme ultraviolet (EUV) lithography for insertion into production at the 15 nm technology node by integrating it into standard semiconductor process flows because we believe that device integration exercises provide the truest test of technology readiness and, at the same time, highlight the remaining critical issues. In this paper, we describe the use of EUV lithography with the 0.25 NA Alpha Demo Tool (ADT) to pattern the contact and first interconnect levels of a large (~24 mm x 32 mm) 22 nm node test chip using EUV masks with state-of-the-art defectivity (~0.3 defects/cm2). We have found that: 1) the quality of EUVL printing at the 22 nm node is considerably higher than the printing produced with 193 nm immersion lithography; 2) printing at the 22 nm node with EUV lithography results in higher yield than double exposure double-etch 193i lithography; and 3) EUV lithography with the 0.25 NA ADT is capable of supporting some early device development work at the 15 nm technology node.

  14. High-performance next-generation EUV lithography light source

    Science.gov (United States)

    Choi, Peter; Zakharov, Sergey V.; Aliaga-Rossel, Raul; Benali, Otman; Duffy, Grainne; Sarroukh, Ouassima; Wyndham, Edmund; Zakharov, Vasily S.

    2009-03-01

    EUVL solution for HVM at the 22 nm node requires a high power long-term EUV source operation with hundreds of watts at the intermediate focus output. EUV mask blank and mask defects inspections require at-wavelength tools with high brightness. Theoretical analysis with a 2-D radiation MHD code Z* has been performed to address key issues in EUV plasma sources with radiation transfer. The study shows that self-absorption defines the limiting brightness of a single EUV source, which cannot meet the requirements of the HVM tool with high efficiency and is not sufficient for critical metrology applications, given the limiting etendue of the optics. It is shown that the required irradiance can be achieved by spatial multiplexing, using multiple small sources. We present here details of the study, as well as experimental results from a novel EUV light source with an intrinsic photon collector demonstrating high brightness, the i-SoCoMo concept, where an impulse micro discharge plasma source is integrated to a photon collector based on an active plasma structure. The small physical size and low etendue properties of the i-SoCoMo unit allows a large number of such sources to be put together in one physical package and be operated in a multiplexed fashion to meet necessary power requirements.

  15. Energy deposition and charging in EUV lithography: Monte Carlo studies

    Science.gov (United States)

    Wiseheart, Liam; Narasimhan, Amrit; Grzeskowiak, Steven; Neisser, Mark; Ocola, Leonidas E.; Denbeaux, Greg; Brainard, Robert L.

    2016-03-01

    EUV photons expose photoresists by complex interactions including photoionization to create primary electrons (~80 eV), and subsequent ionization steps that create secondary electrons (10-60 eV). The mechanisms by which these electrons interact with resist components are key to optimizing the performance of EUV resists and EUV lithography as a whole. As these photoelectrons and secondary electrons are created, they deposit their energy within the resist, creating ionized atoms along the way. Because many photo- and secondary electrons can escape the resist through the surface, resists can become charged. Charging and energy deposition profiles within the resist may play a role in the sensitivity and line-edge roughness of EUV resists. In this paper, we present computational analysis of charging-influenced electron behavior in photoresists using LESiS (Low energy Electron Scattering in Solids), a software developed to understand and model electron-matter interactions. We discuss the implementation of charge and tracking and the model used to influence electron behavior. We also present the potential effects of charging on EUV and electron beam lithography by investigating secondary electron blur in charging and non-charging models.

  16. Determining the Critcial Size of EUV Mask Substrate Defects

    Energy Technology Data Exchange (ETDEWEB)

    Mccall, Monnikue M; Han, Hakseung; Cho, Wonil; Goldberg, Kenneth; Gullikson, Eric; Jeon, Chan-Uk; Wurm, Stefan

    2008-02-28

    Determining the printability of substrate defects beneath the extreme ultraviolet (EUV) reflecting multilayer stack is an important issue in EUVL lithography. Several simulation studies have been performed in the past to determine the tolerable defect size on EUV mask blank substrates but the industry still has no exact specification based on real printability tests. Therefore, it is imperative to experimentally determine the printability of small defects on a mask blanks that are caused by substrate defects using direct printing of programmed substrate defect in an EUV exposure tool. SEMATECH fabricated bump type program defect masks using standard electron beam lithography and performed printing tests with the masks using an EUV exposure tool. Defect images were also captured using SEMATECH's Berkeley Actinic Imaging Tool in order to compare aerial defect images with secondary electron microscope images from exposed wafers. In this paper, a comprehensive understanding of substrate defect printability will be presented and printability specifications of EUV mask substrate defects will be discussed.

  17. Determining the critical size of EUV mask substrate defects

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Gullikson, Eric M.; Han, Hakseung; Cho, Wonil; Jeon, Chan-Uk; Wurm, Stefan

    2008-05-26

    Determining the printability of substrate defects beneath the extreme ultraviolet (EUV) reflecting multilayer stack is an important issue in EUVL lithography. Several simulation studies have been performed in the past to determine the tolerable defect size on EUV mask blank substrates but the industry still has no exact specification based on real printability tests. Therefore, it is imperative to experimentally determine the printability of small defects on a mask blanks that are caused by substrate defects using direct printing of programmed substrate defect in an EUV exposure tools. SEMATECH fabricated bump type program defect masks using standard electron beam lithography and performed printing tests with the masks using an EUV exposure tool. Defect images were also captured using SEMATECH's Berkeley Actinic Imaging Tool in order to compare aerial defect images with secondary electron microscope images from exposed wafers. In this paper, a comprehensive understanding of substrate defect printability will be presented and printability specifications of EUV mask substrate defects will be discussed.

  18. The Methodology Factor in Teaching ESP.

    Science.gov (United States)

    Biria, Reza; Tahririan, M. Hassan

    1994-01-01

    The efficacy of different methods of teaching English for Special Purposes (ESP) was studied, with focus on whether the communicative method is compatible with the goals of ESP teaching. The role on ESP learning of general English taught at high school was also examined. (Contains 15 references.) (LB)

  19. Statistical simulation of photoresists at EUV and ArF

    Science.gov (United States)

    Biafore, John J.; Smith, Mark D.; Mack, Chris A.; Thackeray, James W.; Gronheid, Roel; Robertson, Stewart A.; Graves, Trey; Blankenship, David

    2009-03-01

    Requirements of resist modeling strategies for EUV and low-k1 ArF nanolithography continue to become more stringent. Resist designers are consistently faced with the task of reducing exposure dose and line roughness while simultaneously improving exposure latitude, depth-of-focus and ultimate resolution. In this work, we briefly discuss a next-generation resist model for the prediction of statistical resist responses such as line-edge roughness, line-width roughness and CD variability, as well as base lithographic responses such as exposure latitude. The model's parameterized fit to experimental data from a state-of-the art polymer-bound PAG resist irradiated at ArF and EUV will be shown. The probabilistic computation of acid generation at ArF and EUV will be discussed. The factors influencing the hypothesized primary cause of resist roughness, acid shot noise, are discussed.

  20. Stochastic exposure kinetics of EUV photoresists: a simulation study

    Science.gov (United States)

    Mack, Chris A.; Thackeray, James W.; Biafore, John J.; Smith, Mark D.

    2011-04-01

    BACKGROUND: The stochastic nature of extreme ultraviolet (EUV) resist exposure leads to variations in the resulting acid concentration, which leads to line-edge roughness (LER) of the resulting features. METHODS: Using a stochastic resist simulator, we predicted the mean and standard deviation of the acid concentration for an open-frame exposure and fit the results to analytical expressions. RESULTS: The EUV resist exposure mechanism of the PROLTIH Stochastic Resist Simulator is first order, and an analytical expression for the exposure rate constant C allows prediction of the mean acid concentration of an open-frame exposure to about 1% accuracy over a wide range of parameter values. A second analytical expression for the standard deviation of the acid concentration also matched the output of PROLITH to within about 1%. CONCLUSIONS: Predicting the stochastic uncertainty in acid concentration for EUV resists allows optimization of resist processing and formulations, and may form the basis of a comprehensive LER model.

  1. EUV-multilayers on grating-like topographies

    Energy Technology Data Exchange (ETDEWEB)

    van Boogaard, A. J. R.; Louis, E.; Goldberg, K. A.; Mochi, I.; Bijkerk, F.

    2010-03-12

    In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 {micro}m). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources.

  2. LPP EUV source readiness for NXE 3300B

    Science.gov (United States)

    Brandt, David C.; Fomenkov, Igor V.; Farrar, Nigel R.; La Fontaine, Bruno; Myers, David W.; Brown, Daniel J.; Ershov, Alex I.; Böwering, Norbert R.; Riggs, Daniel J.; Rafac, Robert J.; De Dea, Silvia; Peeters, Rudy; Meiling, Hans; Harned, Noreen; Smith, Daniel; Pirati, Alberto; Kazinczi, Robert

    2014-03-01

    Laser produced plasma (LPP) light sources have been developed as the primary approach for EUV scanner imaging of circuit features in sub-20nm devices in high volume manufacturing (HVM). This paper provides a review of development progress and readiness status for the LPP extreme-ultra-violet (EUV) source. We present the latest performance results from second generation sources, including Prepulse operation for high power, collector protection for long lifetime and low cost of ownership, and dose stability for high yield. Increased EUV power is provided by a more powerful drive laser and the use of Prepulse operation for higher conversion efficiciency. Advanced automation and controls have been developed to provide the power and energy stability performance required during production fab operation. We will also discuss lifetesting of the collector in Prepulse mode and show the ability of the debris mitigation systems to keep the collector multi-layer coating free from damage and maintain high reflectivity.

  3. Lithographic performance evaluation of a contaminated EUV mask after cleaning

    Energy Technology Data Exchange (ETDEWEB)

    George, Simi; Naulleau, Patrick; Okoroanyanwu, Uzodinma; Dittmar, Kornelia; Holfeld, Christian; Wuest, Andrea

    2009-11-16

    The effect of surface contamination and subsequent mask surface cleaning on the lithographic performance of a EUV mask is investigated. SEMATECH's Berkeley micro-field exposure tool (MET) printed 40 nm and 50 nm line and space (L/S) patterns are evaluated to compare the performance of a contaminated and cleaned mask to an uncontaminated mask. Since the two EUV masks have distinct absorber architectures, optical imaging models and aerial image calculations were completed to determine any expected differences in performance. Measured and calculated Bossung curves, process windows, and exposure latitudes for the two sets of L/S patterns are compared to determine how the contamination and cleaning impacts the lithographic performance of EUV masks. The observed differences in mask performance are shown to be insignificant, indicating that the cleaning process did not appreciably affect mask performance.

  4. EUV mask reflectivity measurements with micro-scale spatial resolution

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Rekawa, Senajith B.; Kemp, Charles D.; Barty, Anton; Anderson, Erik; Kearney, Patrick; Han, Hakseung

    2008-02-01

    The effort to produce defect-free mask blanks for EUV lithography relies on increasing the detection sensitivity of advanced mask inspection tools, operating at several wavelengths. They describe the unique measurement capabilities of a prototype actinic (EUV) wavelength microscope that is capable of detecting small defects and reflectivity changes that occur on the scale of microns to nanometers. The defects present in EUV masks can appear in many well-known forms: as particles that cause amplitude or phase variations in the reflected field; as surface contamination that reduces reflectivity and contrast; and as damage from inspection and use that reduces the reflectivity of the multilayer coating. This paper presents an overview of several topics where scanning actinic inspection makes a unique contribution to EUVL research. They describe the role of actinic scanning inspection in defect repair studies, observations of laser damage, actinic inspection following scanning electron microscopy, and the detection of both native and programmed defects.

  5. Energy effective dual-pulse bispectral laser for EUV lithography

    Science.gov (United States)

    Zhevlakov, A. P.; Seisyan, R. P.; Bespalov, V. G.; Elizarov, V. V.; Grishkanich, A. S.; Kascheev, S. V.; Sidorov, I. S.

    2016-03-01

    The power consumption in the two-pulse bispectral primary source could be substantially decreased by replacing the SRS converters from 1.06 μm into 10.6 μm wavelength as the preamplifier cascades in CO2 laser channel at the same efficiency radiation of EUV source. The creation of high volume manufacturing lithography facilities with the technological standard of 10-20 nm is related to the implementation of resist exposure modes with pulse repetition rate of 100 kHz. Low power consumption of the proposed scheme makes it promising for the creation of LPP EUV sources.

  6. Collecting EUV mask images through focus by wavelength tuning

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Huh, Sungmin

    2009-02-23

    Using an extreme-ultraviolet (EUV) microscope to produce high-quality images of EUV reticles, we have developed a new wavelength tuning method to acquire through-focus data series with a higher level of stability and repeatability than was previously possible. We utilize the chromatic focal-length dependence of a diffractive Fresnel zoneplate objective lens, and while holding the mask sample mechanically still, we tune the wavelength through a narrow range, in small steps. In this paper, we demonstrate the method and discuss the relative advantages that this data collection technique affords.

  7. EUV photoresist performance results from the VNL and the EUV LLC

    Science.gov (United States)

    Cobb, Jonathan L.; Dentinger, Paul M.; Hunter, Luke L.; O'Connell, Donna J.; Gallatin, Gregg M.; Hinsberg, William D.; Houle, Frances A.; Sanchez, Martha I.; Domke, Wolf-Dieter; Wurm, Stefan; Okoroanyanwu, Uzodinma; Lee, Sang Hun

    2002-07-01

    If EUV lithography is to be inserted at the 65-nm node of the 2001 International Technology Roadmap for Semiconductors, beta-tool resists must be ready in 2004. These resists should print 35-65 nm lines on a 130-nm pitch with LER below 4 nm 3s. For throughput considerations, the sizing dose should be below 4 mJ/cm2. The VNL and EUV LLC resist development program has measured the resolution, LER, and sizing dose of approximately 60 ESCAP photoresists with the 10X exposure tools at Sandia National Laboratories. The NA of these tools is 0.088, and every resist measured would support the beta-tool resolution requirement if the resolution scales with NA as predicted by optics. 50-nm dense lines have been printed with monopole off-axis illumination, but 35-nm resolution on a 130-nm pitch remains to be demonstrated. Only one photoresist met the LER specification, but its sizing dose of 22 mJ/cm2 is over five times too large. The power spectral density of the roughness of every resist has a Lorentzian line shape, and most of the roughness comes from frequencies within the resolution of the exposure tools. This suggests a strong contribution from mask and optics, but more work needs to be done to determine the source of the roughness. Many resists have sizing doses below the 4 mJ/cm2 target, and neither resolution nor LER degrades with decreasing sizing dose, suggesting that shot noise is not yet affecting the results. The best overall resist resolved 80-nm dense lines with 5.3 nm 3s LER on 100-nm dense lines at a sizing dose of 3.2 mJ/cm2. Thus, it comes close to, but does not quite meet, the beta-tool resist targets.

  8. Results from laboratory and field testing of nitrate measuring spectrophotometers

    Science.gov (United States)

    Snazelle, Teri T.

    2015-01-01

    Five ultraviolet (UV) spectrophotometer nitrate analyzers were evaluated by the U.S. Geological Survey (USGS) Hydrologic Instrumentation Facility (HIF) during a two-phase evaluation. In Phase I, the TriOS ProPs (10-millimeter (mm) path length), Hach NITRATAX plus sc (5-mm path length), Satlantic Submersible UV Nitrate Analyzer (SUNA, 10-mm path length), and S::CAN Spectro::lyser (5-mm path length) were evaluated in the HIF Water-Quality Servicing Laboratory to determine the validity of the manufacturer's technical specifications for accuracy, limit of linearity (LOL), drift, and range of operating temperature. Accuracy specifications were met in the TriOS, Hach, and SUNA. The stock calibration of the S::CAN required two offset adjustments before the analyzer met the manufacturer's accuracy specification. Instrument drift was observed only in the S::CAN and was the result of leaching from the optical path insert seals. All tested models, except for the Hach, met their specified LOL in the laboratory testing. The Hach's range was found to be approximately 18 milligrams nitrogen per liter (mg-N/L) and not the manufacturer-specified 25 mg-N/L. Measurements by all of the tested analyzers showed signs of hysteresis in the operating temperature tests. Only the SUNA measurements demonstrated excessive noise and instability in temperatures above 20 degrees Celsius (°C). The SUNA analyzer was returned to the manufacturer at the completion of the Phase II field deployment evaluation for repair and recalibration, and the performance of the sensor improved significantly.

  9. Skin color analysis using a spectrophotometer in Asians.

    Science.gov (United States)

    Yun, In Sik; Lee, Won Jai; Rah, Dong Kyun; Kim, Yong Oock; Park, Be-young Yun

    2010-08-01

    To objectively describe skin color, the Commission International d'Eclairage (CIE) L*a*b* color coordinates and melanin and erythema indexes are used. However, it was difficult to understand the relationship among these parameters and to convert them into each other. We introduced a new technique to measure L*a*b* color coordinates and the melanin and erythema indexes at the same time. We analyzed the skin color of normal Asians using this method. The skin color of the forehead, cheek, upper inner arm, dorsum of hand, and anterior chest of 148 volunteers was measured using a spectrophotometer. Using a computer analysis program, L*a*b* values and the melanin and erythema indexes were presented at the same time. The averages of these data were shown according to gender, age, body parts, and correlations among the melanin and erythema indexes and L*a*b* color coordinates, and then they were analyzed. The averages of the melanin and erythema indexes of 148 participants were 1.10 +/- 0.29 and 1.29 +/- 0.38, respectively. The averages of the L*, a*, and b* values were 64.15 +/- 4.86, 8.96 +/- 2.65, and 18.34 +/- 2.39, respectively. The melanin and erythema indexes were higher in males than in females. While the correlation of the melanin index with the L* value was negative, it was positively correlated with the a* and b* values. While the erythema index showed a weak correlation with the b* value, its correlation was negative with the L* value and positive with the a* value. Our method of skin color measurement is useful. We consider the data of this study valuable basic data for the evaluation of colors of pigmental skin diseases and scars in the future.

  10. Construction of a photochemical reactor combining a CCD spectrophotometer and a LED radiation source.

    Science.gov (United States)

    Gombár, Melinda; Józsa, Éva; Braun, Mihály; Ősz, Katalin

    2012-10-01

    An inexpensive photoreactor using LED light sources and a fibre-optic CCD spectrophotometer as a detector was built by designing a special cell holder for standard 1.000 cm cuvettes. The use of this device was demonstrated by studying the aqueous photochemical reaction of 2,5-dichloro-1,4-benzoquinone. The developed method combines the highly quantitative data collection of CCD spectrophotometers with the possibility of illuminating the sample independently of the detecting light beam, which is a substantial improvement of the method using diode array spectrophotometers as photoreactors.

  11. Oxide Nanoparticle EUV (ONE) Photoresists: Current Understanding of the Unusual Patterning Mechanism

    KAUST Repository

    Jiang, Jing

    2015-01-01

    © 2015 SPST. In the past few years, industry has made significant progress to deliver a stable high power EUV scanner and a 100 W light source is now being tested on the manufacuring scale. The success of a high power EUV source demands a fast and high resolution EUV resist. However, chemcially amplied resists encounter unprecedented challenges beyond the 22 nm node due to resolution, roughness and sensitivity tradeoffs. Unless novel solutions for EUV resists are proposed and further optimzed, breakthroughs can hardly be achieved. Oxide nanoparticle EUV (ONE) resists stablized by organic ligands were originally proposed by Ober et al. Recently this work attracts more and more attention due to its extraordinanry EUV sensitivity. This new class of photoresist utilizes ligand cleavage with a ligand exchange mechanism to switch its solubilty for dual-tone patterning. Therefore, ligand selection of the nanoparticles is extremely important to its EUV performance.

  12. Transmission grating spectrometer for broadband characterization of EUV sources

    NARCIS (Netherlands)

    Bayraktar, Muharrem; Bastiaens, Hubertus M.J.; Bruineman, C.; Vratzov, B.; Bijkerk, Frederik

    2016-01-01

    Emission from extreme ultraviolet (EUV) light sources for lithography and metrology applications needs to be maximized in a narrow wavelength band. On the other hand, these sources also emit radiation outside this wavelength band, extending into the deep ultraviolet (DUV) and visible/IR range. To

  13. Extreme Ultraviolet (EUV) induced surface chemistry on Ru

    NARCIS (Netherlands)

    Liu, Feng; Sturm, Jacobus Marinus; Osorio, E.; van Kampen, M.; Lee, Christopher James; Bijkerk, Frederik

    2013-01-01

    Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We

  14. Investigation of a novel discharge EUV source for microlithography

    Science.gov (United States)

    Bauer, Bruno S.; Makhin, Volodymyr; Fuelling, Stephan; Lindemuth, Irvin R.

    2006-03-01

    A plasma discharge could be an inexpensive and efficient EUV source for microlithography, if issues of brightness, lifetime, debris, repetition rate, and stability can be resolved. A novel discharge EUV source (international patent pending) is being investigated that may offer an economical solution to these issues. The novel EUV discharge seeks to efficiently assemble a hot, dense, uniform, axially stable plasma with magnetic pressure and inductive current drive, employing resonant theta-pinch-type compression of plasma confined in a magnetic mirror. This resonantly compressed mirror plasma (RCMP) source would be continuously driven by a radio frequency oscillator, to obtain an EUV conversion efficiency greater than that of sources in which the plasma is discarded after each radiation burst. An analytic calculation indicates the novel RCMP source could provide 115 W of 13.45 nm radiation in 3.3 mm2sr etendue to an intermediate focus. Numerical modeling of RCMP dynamics has been performed with MHRDR-EUVL, a magnetohydrodynamic (MHD) numerical simulation with atomic and radiation physics. The numerical simulation demonstrates the efficacy of resonant magneto-acoustic heating. An experiment is being developed to test the new concept.

  15. The EUV Spectrum of Sunspot Plumes Observed by SUMER on ...

    Indian Academy of Sciences (India)

    tribpo

    J. Astrophys. Astr. (2000) 21, .397-401. The EUV Spectrum of Sunspot Plumes Observed by SUMER on. SOHO. W. Curdt,. 1. B. N. Dwivedi. 2. & U. Feldman. 3. 1. Max-Planck-Institut für Aeronomie, D-37191, Katlenburg-Lindau, Germany. 2. Department of Applied Physics, Banaras Hindu University, Varanasi-221005, India.

  16. Benchmarking EUV mask inspection beyond 0.25 NA

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Anderson, Erik H.; Rekawa, Seno B.; Kemp, Charles D.; Huh, S.; Han, H.-S.; Naulleau, P.; Gunion, R.F.

    2008-09-18

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV-wavelength mask inspection microscope designed for direct aerial image measurements, and pre-commercial EUV mask research. Operating on a synchrotron bending magnet beamline, the AIT uses an off-axis Fresnel zoneplate lens to project a high-magnification EUV image directly onto a CCD camera. We present the results of recent system upgrades that have improved the imaging resolution, illumination uniformity, and partial coherence. Benchmarking tests show image contrast above 75% for 100-nm mask features, and significant improvements and across the full range of measured sizes. The zoneplate lens has been replaced by an array of user-selectable zoneplates with higher magnification and NA values up to 0.0875, emulating the spatial resolution of a 0.35-NA 4 x EUV stepper. Illumination uniformity is above 90% for mask areas 2-{micro}m-wide and smaller. An angle-scanning mirror reduces the high coherence of the synchrotron beamline light source giving measured {sigma} values of approximately 0.125 at 0.0875 NA.

  17. Actinic EUV mask inspection beyond 0.25 NA

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Anderson, Erik H.; Rekawa, Seno. B.; Kemp, Charles D.; Huh, S.; Han, H.-S.; Naulleau, P.; Huh, S.

    2008-03-24

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV-wavelength mask inspection microscope designed for direct aerial image measurements, and pre-commercial EUV mask research. Operating on a synchrotron bending magnet beamline, the AIT uses an off-axis Fresnel zoneplate lens to project a high-magnification EUV image directly onto a CCD camera. We present the results of recent system upgrades that have improved the imaging resolution, illumination uniformity, and partial coherence. Benchmarking tests show image contrast above 75% for 100-nm mask features, and significant improvements and across the full range of measured sizes. The zoneplate lens has been replaced by an array of user-selectable zoneplates with higher magnification and NA values up to 0.0875, emulating the spatial resolution of a 0.35-NA 4x EUV stepper. Illumination uniformity is above 90% for mask areas 2-{micro}m-wide and smaller. An angle-scanning mirror reduces the high coherence of the synchrotron beamline light source giving measured {sigma} values of approximately 0.125 at 0.0875 NA.

  18. Integrated approach to improving local CD uniformity in EUV patterning

    Science.gov (United States)

    Liang, Andrew; Hermans, Jan; Tran, Timothy; Viatkina, Katja; Liang, Chen-Wei; Ward, Brandon; Chuang, Steven; Yu, Jengyi; Harm, Greg; Vandereyken, Jelle; Rio, David; Kubis, Michael; Tan, Samantha; Dusa, Mircea; Singhal, Akhil; van Schravendijk, Bart; Dixit, Girish; Shamma, Nader

    2017-03-01

    Extreme ultraviolet (EUV) lithography is crucial to enabling technology scaling in pitch and critical dimension (CD). Currently, one of the key challenges of introducing EUV lithography to high volume manufacturing (HVM) is throughput, which requires high source power and high sensitivity chemically amplified photoresists. Important limiters of high sensitivity chemically amplified resists (CAR) are the effects of photon shot noise and resist blur on the number of photons received and of photoacids generated per feature, especially at the pitches required for 7 nm and 5 nm advanced technology nodes. These stochastic effects are reflected in via structures as hole-to-hole CD variation or local CD uniformity (LCDU). Here, we demonstrate a synergy of film stack deposition, EUV lithography, and plasma etch techniques to improve LCDU, which allows the use of high sensitivity resists required for the introduction of EUV HVM. Thus, to improve LCDU to a level required by 5 nm node and beyond, film stack deposition, EUV lithography, and plasma etch processes were combined and co-optimized to enhance LCDU reduction from synergies. Test wafers were created by depositing a pattern transfer stack on a substrate representative of a 5 nm node target layer. The pattern transfer stack consisted of an atomically smooth adhesion layer and two hardmasks and was deposited using the Lam VECTOR PECVD product family. These layers were designed to mitigate hole roughness, absorb out-of-band radiation, and provide additional outlets for etch to improve LCDU and control hole CD. These wafers were then exposed through an ASML NXE3350B EUV scanner using a variety of advanced positive tone EUV CAR. They were finally etched to the target substrate using Lam Flex dielectric etch and Kiyo conductor etch systems. Metrology methodologies to assess dimensional metrics as well as chip performance and defectivity were investigated to enable repeatable patterning process development. Illumination

  19. An extinction scale-expansion unit for the Beckman DK2 spectrophotometer

    Science.gov (United States)

    Dixon, M.

    1967-01-01

    The paper describes a simple but accurate unit for the Beckman DK2 recording spectrophotometer, whereby any 0·1 section of the extinction (`absorbance') scale may be expanded tenfold, while preserving complete linearity in extinction. PMID:6048800

  20. Evaluation of accuracy of shade selection using two spectrophotometer systems: Vita Easyshade and Degudent Shadepilot.

    Science.gov (United States)

    Kalantari, Mohammad Hassan; Ghoraishian, Seyed Ahmad; Mohaghegh, Mina

    2017-01-01

    The aim of this in vitro study was to evaluate the accuracy of shade matching using two spectrophotometric devices. Thirteen patients who require a full coverage restoration for one of their maxillary central incisors were selected while the adjacent central incisor was intact. 3 same frameworks were constructed for each tooth using computer-aided design and computer-aided manufacturing technology. Shade matching was performed using Vita Easyshade spectrophotometer, Shadepilot spectrophotometer, and Vitapan classical shade guide for the first, second, and third crown subsequently. After application, firing, and glazing of the porcelain, the color was evaluated and scored by five inspectors. Both spectrophotometric systems showed significantly better results than visual method (P spectrophotometers (P Spectrophotometers are a good substitute for visual color selection methods.

  1. Performance of the ASML EUV Alpha Demo Tool

    Science.gov (United States)

    Hermans, Jan V.; Hendrickx, Eric; Laidler, David; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Anne-Marie

    2010-04-01

    The 22nm technology node is the target for insertion of Extreme Ultra-Violet (EUV) lithography into pre-production. To prepare this insertion, the issues that arise with the use of an EUV lithographic scanner in a pre-production environment need to be addressed. To gain better understanding of the issues that come with an EUV lithographic scanner, the Alpha Demo Tool (ADT) from ASML was installed at IMEC and is now in use since mid of 2008. In July 2009, the source was upgraded to a 170W/2π source to allow for higher uptime and wafer output by means of the semi-automatic tin refill. Also a new advanced resist, the SEVR-59 resist was introduced after the installation of the 170W/2π source to allow printing of 32nm Lines-Spaces (LS). After these changes, the ADT has been monitored closely with respect to the imaging performance. In this paper, we report on both the CD fingerprint analysis and the exposure tool stability. For 32nm dense LS, the ADT shows a wafer CD Uniformity (CDU) of 2.5nm 3σ, without any corrections for process or reticle. As for 40nm LS, the wafer CDU is correlated to different factors that are known to influence the CD fingerprint from traditional lithography: reticle CD error, slit intensity uniformity, focal plane deviation but also EUV specific reticle shadowing. The ADT shows excellent wafer-to-wafer stability (tool (using the same etched silicon wafers as a reference). Below 32nm, the ADT shows good wafer CDU for 30nm dense LS (60nm pitch). First 27nm dense line CDU data are achieved (54nm pitch). The results indicate that the ADT can be used effectively for EUV process development before installation of the pre-production tool, the ASML NXE:3100 at IMEC.

  2. Versatile IEEE-488 data acquisition and control routines for a diode array spectrophotometer

    OpenAIRE

    Shiundu, Paul M.; Wade, Adrian P.

    1991-01-01

    The UV-visible diode array spectrophotometer is a work-horse instrument for many laboratories. This article provides simple data acquisition and control routines in Microsoft QuickBasic for a HP-8452A diode array spectrophotometer interfaced to an IBM PC/XT/AT, or compatible, microcomputer. These allow capture of full spectra and measure absorbance at one or several wavelengths at preset time intervals. The variance in absorbance at each wavelength is available as an option.

  3. Versatile IEEE-488 data acquisition and control routines for a diode array spectrophotometer

    Science.gov (United States)

    Shiundu, Paul M.

    1991-01-01

    The UV-visible diode array spectrophotometer is a work-horse instrument for many laboratories. This article provides simple data acquisition and control routines in Microsoft QuickBasic for a HP-8452A diode array spectrophotometer interfaced to an IBM PC/XT/AT, or compatible, microcomputer. These allow capture of full spectra and measure absorbance at one or several wavelengths at preset time intervals. The variance in absorbance at each wavelength is available as an option. PMID:18924888

  4. EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology

    Science.gov (United States)

    Stamm, U.; Kleinschmidt, J.; Gabel, K.; Hergenhan, G.; Ziener, C.; Schriever, G.; Ahmad, I.; Bolshukhin, D.; Brudermann, J.; de Bruijn, R.; Chin, T. D.; Geier, A.; Gotze, S.; Keller, A.; Korobotchko, V.; Mader, B.; Ringling, J.; Brauner, T.

    2005-05-01

    In the paper we report about the progress made at XTREME technologies in the development of EUV sources based on gas discharge produced plasma (GDPP) technologies and laser produced plasma (LPP) technologies. First prototype xenon GDPP sources of the type XTS 13-35 based on the Z-pinch principle with 35 W power in 2π sr have been integrated into micro-exposure tools from Exitech, UK. Specifications of the EUV sources and experience of integration as well as data about component and optics lifetime are presented. In the source development program for Beta exposure tools and high volume manufacturing exposure tools both tin and xenon have been investigated as fuel for the EUV sources. Development progress in porous metal cooling technology as well as pulsed power circuit design has led to GDPP sources with xenon fuel continuous operating with an output power of 200 W in 2π sr at 4500 Hz repetition rate. With tin fuel an output power of 400 W in 2π sr was obtained leaving all other conditions unaltered with respect to the xenon based source. The performance of the xenon fueled sources is sufficiently good to fulfill all requirements up to the beta tool level. For both the xenon and the tin GDPP sources detailed data about source performance are reported, including component lifetime and optics lifetime. The status of the integration of the sources with grazing incidence collector optics is discussed. Theoretical estimations of collection efficiencies are compared with experimental data to determine the loss mechanisms in the beam path. Specifically contamination issues related to tin as target material as well as debris mitigation in tin sources is addressed. As driver lasers for the LPP source research diode-pumped Nd:YAG lasers have been used to generate EUV emitting plasma. As target material xenon has been employed. Conversion efficiencies have been measured and currently the maximum conversion efficiency amounts to 1 %. The laser driver power of 1.2 kW is

  5. Analysing ESP Texts, but How?

    Directory of Open Access Journals (Sweden)

    Borza Natalia

    2015-03-01

    Full Text Available English as a second language (ESL teachers instructing general English and English for specific purposes (ESP in bilingual secondary schools face various challenges when it comes to choosing the main linguistic foci of language preparatory courses enabling non-native students to study academic subjects in English. ESL teachers intending to analyse English language subject textbooks written for secondary school students with the aim of gaining information about what bilingual secondary school students need to know in terms of language to process academic textbooks cannot avoiding deal with a dilemma. It needs to be decided which way it is most appropriate to analyse the texts in question. Handbooks of English applied linguistics are not immensely helpful with regard to this problem as they tend not to give recommendation as to which major text analytical approaches are advisable to follow in a pre-college setting. The present theoretical research aims to address this lacuna. Respectively, the purpose of this pedagogically motivated theoretical paper is to investigate two major approaches of ESP text analysis, the register and the genre analysis, in order to find the more suitable one for exploring the language use of secondary school subject texts from the point of view of an English as a second language teacher. Comparing and contrasting the merits and limitations of the two contrastive approaches allows for a better understanding of the nature of the two different perspectives of text analysis. The study examines the goals, the scope of analysis, and the achievements of the register perspective and those of the genre approach alike. The paper also investigates and reviews in detail the starkly different methods of ESP text analysis applied by the two perspectives. Discovering text analysis from a theoretical and methodological angle supports a practical aspect of English teaching, namely making an informed choice when setting out to analyse

  6. Clinical evaluation of a dental color analysis system: the Crystaleye Spectrophotometer®.

    Science.gov (United States)

    Odaira, Chikayuki; Itoh, Sozo; Ishibashi, Kanji

    2011-10-01

    To evaluate the clinical performance of the Crystaleye Spectrophotometer(®), a dental color analysis system. Three color-measuring devices (Crystaleye Spectrophotometer(®), CAS-ID1, MSC-2000) were tested and the differences in color measurements among them were evaluated using Scheffe's F-test. Color measurements with the Crystaleye Spectrophotometer(®) were repeated 10 times by the same operator. The color difference (ΔE) between the first and tenth measurements was calculated. The Crystaleye Spectrophotometer(®) was used to measure the color of the maxillary left central incisor under two conditions (light and dark) and the effect of exterior lighting was analyzed to assess the accuracy of measurements. Furthermore, five different operators performed color measurements, and ΔE among the three devices was calculated. The ΔE between the target tooth and the crown of a single maxillary central incisor crown fabricated using data from the Crystaleye Spectrophotmeter(®) was calculated. Color differences between prebleaching and postbleaching were also analyzed with the Crystaleye Spectrophotometer(®) using the parameters ΔE, ΔL*, Δa*, and Δb*. The data from the three spectrophotometers were not significantly different. The ΔE during repeated color measurements by the same operator was 0.6. The ΔE between light and dark conditions was 0.9. The data from the five operators were not significantly different. The mean ΔE value between the target tooth and the fabricated crown was 1.2 ± 0.4, and the mean ΔE value between prebleaching and postbleaching was 3.7 ± 1.0. The Crystaleye Spectrophotometer(®) is an easy-to-use color analysis system producing accurate color measurements under clinical conditions. Copyright © 2011 Japan Prosthodontic Society. Published by Elsevier Ltd. All rights reserved.

  7. The Methodological Component in ESP Operations.

    Science.gov (United States)

    Markee, Numa

    1984-01-01

    Reviews recent literature in second language acquisition (particularly concerning Krashen's Input Hypothesis) and in English for specific purposes (ESP) to find a firm theoretical basis for the development of communicative approaches to language teaching in ESP contexts. Tries to define the characteristics of noninterference/input strategies that…

  8. EUV Cross-Calibration Strategies for the GOES-R SUVI

    Science.gov (United States)

    Darnel, Jonathan; Seaton, Daniel

    2016-10-01

    The challenges of maintaining calibration for solar EUV instrumentation is well-known. The lack of standard calibration sources and the fact that most solar EUV telescopes are incapable of utilizing bright astronomical EUV sources for calibration make knowledge of instrument performance quite difficult. In the recent past, calibration rocket underflights have helped establish a calibration baseline. The EVE instrument on SDO for a time provided well-calibrated, high spectral resolution solar spectra for a broad range of the EUV, but has suffered a loss of coverage at the shorter wavelengths. NOAA's Solar UltraViolet Imager (SUVI), a solar EUV imager with similarities to SDO/AIA, will provide solar imagery over nearly an entire solar cycle. In order to maintain the scientific value of the SUVI's dataset, novel approaches to calibration are necessary. Here we demonstrate a suite of methods to cross-calibrate SUVI against other solar EUV instruments through the use of proxy solar spectra.

  9. Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) for control of biocompatibility

    Energy Technology Data Exchange (ETDEWEB)

    Ahad, Inam Ul, E-mail: inam-ul.ahad@wat.edu.pl [Institute of Optoelectronics, Military University of Technology, 00-908 Warsaw (Poland); Advanced Processing Technology Research Centre, School of Mechanical and Manufacturing Engineering, Faculty of Engineering & Computing, Dublin City University, Dublin 9 (Ireland); Butruk, Beata [Department of Biotechnology and Bioprocess Engineering, Warsaw University of Technology, Ul. Waryńskiego 1, 00-645 Warsaw (Poland); Ayele, Mesfin; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk [Institute of Optoelectronics, Military University of Technology, 00-908 Warsaw (Poland); Ciach, Tomasz [Department of Biotechnology and Bioprocess Engineering, Warsaw University of Technology, Ul. Waryńskiego 1, 00-645 Warsaw (Poland); Brabazon, Dermot [Advanced Processing Technology Research Centre, School of Mechanical and Manufacturing Engineering, Faculty of Engineering & Computing, Dublin City University, Dublin 9 (Ireland)

    2015-12-01

    Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) was performed in order to enhance the degree of biocompatibility. Polymer samples were irradiated by different number of EUV shots using a laser–plasma based EUV source in the presence of nitrogen gas. The physical and chemical properties of EUV modified PTFE samples were studied using Atomic Force Microscopy, X-ray photoelectron spectroscopy and water contact angle (WCA) methods. Pronounced wall type micro and nano-structures appeared on the EUV treated polymer surfaces resulting in increased surface roughness and hydrophobicity. Stronger cell adhesion and good cell morphology were observed on EUV modified surfaces by in-vitro cell culture studies performed using L929 fibroblasts.

  10. Basic issues associated with four potential EUV resist schemes

    Energy Technology Data Exchange (ETDEWEB)

    Wheeler, D.R. [Sandia National Labs., Albuquerque, NM (United States); Kubiak, G.; Ray-Chaudhuri, A.; Henderson, C. [Sandia National Labs., Livermore, CA (United States)

    1996-06-01

    Four of the better developed resist schemes that are outgrowths of DUV (248 and 193 nm) resist development are considered as candidates for EUV. They are as follows: trilayer, a thin imaging layer on top of a refractor masking/pattern transfer layer on top of a planarizing and processing layer (PPL); solution developed, organometallic bilayer where the imaging and masking layer have been combined into one material on top of a PPL; and finally silylated resists. They are examined in a very general form without regard to the specifics of chemistry of the variations within each group, but rather to what is common to each group and how that affects their effectiveness as candidates for a near term EUV resist. In particular they are examined with respect to sensitivity, potential resolution, optical density, etching selectivity during pattern transfer, and any issues associated with pattern fidelity such as swelling.

  11. Contribution of EUV mask CD variability on LCDU

    Science.gov (United States)

    Qi, Zhengqing John; Rankin, Jed; Sun, Lei; Levinson, Harry

    2017-03-01

    The shrink in feature sizes enabled by EUV lithography introduces a regime where stochastic limits to resolution can manifest in the form of line edge roughness (LER) for line/space patterns and local critical dimension uniformity (LCDU) for contact/holes. To meet increasing tolerances on edge placement error (EPE) and suppression of stochastic effects, an understanding of EUV mask contributions on lithographic patterning variability is essential. The work here explores stochastic noise originating from the mask patterning process and attempts to quantify its contributions towards on-wafer LCDU. A semiempirical approach was used to statistically decompose the mask variability component from the measured LCDU and provide a first-order understanding of the mask's impact on wafer. Taking a more direct approach, a one-to-one correlation of local CD variation between mask and wafer was also experimentally shown, presenting the possibility for predicting the contributions and impact of mask LCDU on wafer prior to exposure.

  12. Study of Novel EUV Absorber : Nickel and Nickel Oxide

    Energy Technology Data Exchange (ETDEWEB)

    Woo, Dong Gon; Kim, Jung Hwan; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho [Hanyang University, Seoul (Korea, Republic of)

    2017-03-15

    The shadowing effect is one of the most urgent issues yet to be solved in high-volume manufacturing using extreme ultraviolet lithography (EUVL). Many studies have been conducted to mitigate the unexpected results caused by shadowing effects. The simplest way to mitigate the shadowing effect is to reduce the thickness of the absorber. Since nickel has high extinction coefficients in the EUV wavelengths, it is one of more promising absorber material candidates. A Ni based absorber exhibited imaging performance comparable to a Tantalum nitride absorber. However, the Ni-based absorber showed a dramatic reduction in horizontal-vertical critical dimension (H-V CD) bias. Therefore, limitations in fabricating a EUV mask can be mitigated by using the Ni based absorber.

  13. Optical, UV, and EUV Oscillations of SS Cygni in Outburst

    Science.gov (United States)

    Mauche, Christopher W.

    2004-07-01

    I provide a review of observations in the optical, UV (HST), and EUV (EUVE and Chandra LETG) of the rapid periodic oscillations of nonmagnetic, disk-accreting, high mass-accretion rate cataclysmic variables (CVs), with particular emphasis on the dwarf nova SS Cyg in outburst. In addition, I drawn attention to a correlation, valid over nearly six orders of magnitude in frequency, between the frequencies of the quasi-periodic oscillations (QPOs) of white dwarf, neutron star, and black hole binaries. This correlation identifies the high frequency quasi-coherent oscillations (so-called ``dwarf nova oscillations'') of CVs with the kilohertz QPOs of low mass X-ray binaries (LMXBs), and the low frequency and low coherence QPOs of CVs with the horizontal branch oscillations (or the broad noise component identified as such) of LMXBs. Assuming that the same mechanisms produce the QPOs of white dwarf, neutron star, and black hole binaries, this correlation has important implications for QPO models.

  14. EUV mask reflectivity measurements with micron-scale spatial resolution

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Rekawa, S.B.; Kemp, C.D.; Barty, A.; Anderson, E.H.; Kearney, Patrick; Han, Hakseung

    2008-05-26

    The effort to produce defect-free mask blanks for EUV lithography relies on increasing the detection sensitivity of advanced mask inspection tools, operating at several wavelengths. We describe the unique measurement capabilities of a prototype actinic (EUV wavelength) microscope that is capable of detecting small defects and reflectivity changes that occur on the scale of microns to nanometers. Types of defects: (a) Buried Substrate Defects: particles & pits (causes amplitude and/or phase variations); (b) Surface Contamination (reduces reflectivity and (possibly) contrast); (c) Damage from Inspection and Use (reduces the reflectivity of the multilayer coating). This paper presents an overview of several topics where scanning actinic inspection makes a unique contribution to EUVL research. We describe the role of actinic scanning inspection in four cases: defect repair studies; observations of laser damage; after scanning electron microscopy; and native and programmed defects.

  15. ESP after thirty years: an overview of the position of ESP in the 1990s

    Directory of Open Access Journals (Sweden)

    Abdullah A. Khuwaileh

    1996-12-01

    Full Text Available In the view of many ESP practitioners and thinkers, the year 1962 has increasingly been considered the year which marks the birth of ESP, the son of ELT (see.for example, Swales 1985: 1-3. The year 1992 could mark the thirtieth birthday of ESP which is a good opportunity to reconsider the sttus of ESP, which is arquably now. The article of Barber (1962 'Some measurable characteristics of modern scientific prose?  indicated clearly the  birth of ESP. On the basis of these considerations, the principal aim of this paper is to take a fresh look at ESP and its status in terms of its current issues and recent drawbacks. Although there has been a common agreement among ESP practitioners, applied linguists, etc. that ESP should not be separated from ELT (Mackay and Mountford 1978 and Widdonwson 1983: 83, for instance, the real and actual conditions of ESP demonstrate that it has started to distant itself from ELT. In fact, the recent circum­ stances of ESP show celarly that there have been some general trends which are ESP bound and perhaps have nothing to do with ELT.

  16. TESIS experiment on EUV imaging spectroscopy of the Sun

    Science.gov (United States)

    Kuzin, S. V.; Bogachev, S. A.; Zhitnik, I. A.; Pertsov, A. A.; Ignatiev, A. P.; Mitrofanov, A. M.; Slemzin, V. A.; Shestov, S. V.; Sukhodrev, N. K.; Bugaenko, O. I.

    2009-03-01

    TESIS is a set of solar imaging instruments in development by the Lebedev Physical Institute of the Russian Academy of Science, to be launched aboard the Russian spacecraft CORONAS-PHOTON in December 2008. The main goal of TESIS is to provide complex observations of solar active phenomena from the transition region to the inner and outer solar corona with high spatial, spectral and temporal resolution in the EUV and Soft X-ray spectral bands. TESIS includes five unique space instruments: the MgXII Imaging Spectroheliometer (MISH) with spherical bent crystal mirror, for observations of the Sun in the monochromatic MgXII 8.42 Å line; the EUV Spectoheliometer (EUSH) with grazing incidence difraction grating, for the registration of the full solar disc in monochromatic lines of the spectral band 280-330 Å; two Full-disk EUV Telescopes (FET) with multilayer mirrors covering the band 130-136 and 290-320 Å; and the Solar EUV Coronagraph (SEC), based on the Ritchey-Chretien scheme, to observe the inner and outer solar corona from 0.2 to 4 solar radii in spectral band 290-320 Å. TESIS experiment will start at the rising phase of the 24th cycle of solar activity. With the advanced capabilities of its instruments, TESIS will help better understand the physics of solar flares and high-energy phenomena and provide new data on parameters of solar plasma in the temperature range 10-10K. This paper gives a brief description of the experiment, its equipment, and its scientific objectives.

  17. Theoretical EUV spectrum of near Pd-like Xe

    CERN Document Server

    Sasaki, A

    2003-01-01

    The EUV spectrum of multiple charged Xe ion is theoretically investigated. The strong emission in the 11 nm band is attributed to 4d-4f transitions of Xe sup 7 sup + to Xe sup 1 sup 8 sup +. The 4d-5p transition of Xe sup 1 sup 0 sup + contributes to the emission in the 13.5 nm band from low density plasma. (author)

  18. Belief, Evaluation, and Performance on an ESP Task

    Science.gov (United States)

    Layton, Bruce D.; Turnbull, Bill

    1975-01-01

    Belief in the possibility of demonstrating ESP on an experimental task and evaluation of ESP were independently manipulated in two laboratory studies investigating the relationship between these varaibles and ESP task performance. (Editor)

  19. High-Resolution EUV Spectroscopy of White Dwarfs

    Science.gov (United States)

    Kowalski, Michael P.; Wood, K. S.; Barstow, M. A.

    2014-01-01

    We compare results of high-resolution EUV spectroscopic measurements of the isolated white dwarf G191-B2B and the binary system Feige 24 obtained with the J-PEX (Joint Plasmadynamic Experiment), which was sponsored jointly by the U.S. Naval Research Laboratory and NASA. J-PEX delivers the world's highest resolution in EUV and does so at high effective area (e.g., more effective area in a sounding rocket than is available with Chandra at adjacent energies, but in a waveband Chandra cannot reach). The capability J-PEX represents is applicable to the astrophysics of hot plasmas in stellar coronae, white dwarfs and the ISM. G191-B2B and Feige 24 are quite distinct hot white dwarf systems having in common that they are bright in the portion of the EUV where He emission features and edges occur, hence they can be exploited to probe both the stellar atmosphere and the ISM, separating those components by model-fitting that sums over all relevant (He) spectral features in the band. There is evidence from these fits that atmospheric He is being detected but the result is more conservatively cast as a pair of upper limits. We discuss how longer duration satellite observations with the same instrumentation could increase exposure to detect atmospheric He in these and other nearby hot white dwarfs.

  20. EUV: induced ablation and surface modifications of solids

    Science.gov (United States)

    Bartnik, A.; Fiedorowicz, H.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Szczurek, A.; Wachulak, P.

    2011-06-01

    In this work results of investigations concerning ablation and surface modification of polymers and some other solids using a laser-plasma EUV source are presented. The plasma radiation was produced using a gas puff target and was focused with a gold-plated grazing incidence ellipsoidal collector. The ablation process was investigated using a scanning electron microscope (SEM) and a quadrupole mass spectrometer (QMS). The chemical changes were investigated by X-ray photoelectron spectroscopy (XPS). Different kinds of micro- and nanostructures created in nearsurface layers of the materials were obtained. Forms of the structures depend on a particular material and the EUV exposure. In case of some polymers even a single shot was sufficient for creation of the visible changes in surface morphology. In case of inorganic solids visible changes required usually the exposure with tens or hundreds of EUV pulses. XPS investigations revealed chemical changes in near surface layers of polymers. Significant differences were revealed in the XPS spectra acquired for irradiated and not-irradiated polymers. Significant decrease of functional groups containing oxygen was indicated. Analysis of QMS spectra indicate emission of different kinds of fragments of the polymer chains including the repeating structural units. In case of some polymers only fragments of the repeating unit were detected.

  1. The Extreme Ultraviolet (EUV) Instrument for the MAVEN Mission

    Science.gov (United States)

    Chamberlin, Phillip C.

    2012-01-01

    The Mars Atmosphere and Volatile Evolution Mission (MAVEN) will explore the variability in the planet's upper atmosphere and ionosphere that is dominated by interactions with the sun, specifically the high-energy photons in the soft X-ray and extreme ultraviolet wavelengths as well as interactions with the solar wind. Scientists will use MAVEN data to determine the current loss rate of volatile compounds from the Mars atmosphere, then extrapolate back in time in order to give historical estimations of state of the Mars atmosphere and climate, its ability to sustain liquid water, and the potential for the Martian habitability. The EUV instrument is critical in measuring the Space Weather driver of this atmospheric variability. It will directly observe a three EUV wavelength ranges and their variability due to solar flares (time scales of seconds to hours) as well as active region evolution (months), which will then act as proxies for a model to determine the entire 0.1-200 nm solar spectrum at all times during the MAVEN mission. These EUV measurements and models results will compliment the other instruments that will provide direct in-situ as well as remote sensing observations of the Martian atmospheric response to this solar driver. This presentation will be an introduction of this instrument and its science measurements and goals to the larger community, as well as a status report on its progress.

  2. Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Huadong; Zhang, Jun; Ma, Suli [Key Laboratory of Solar Activity, National Astronomical Observatories, Chinese Academy of Sciences, Beijing 100012 (China); Yan, Xiaoli [Yunnan Observatories, Chinese Academy of Sciences, Kunming 650011 (China); Xue, Jianchao, E-mail: hdchen@nao.cas.cn, E-mail: zjun@nao.cas.cn [Key Laboratory for Dark Matter and Space Science, Purple Mountain Observatory, Chinese Academy of Sciences, Nanjing 210008 (China)

    2017-05-20

    We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19–20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearby coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ∼280 km s{sup −1}. During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ∼8 G.

  3. Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

    Science.gov (United States)

    Chen, Huadong; Zhang, Jun; Ma, Suli; Yan, Xiaoli; Xue, Jianchao

    2017-05-01

    We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19-20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearby coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ˜280 km s-1. During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ˜8 G.

  4. Measurement of protein-like fluorescence in river and waste water using a handheld spectrophotometer.

    Science.gov (United States)

    Baker, Andy; Ward, David; Lieten, Shakti H; Periera, Ryan; Simpson, Ellie C; Slater, Malcolm

    2004-07-01

    Protein-like fluorescence intensity in rivers increases with increasing anthropogenic DOM inputs from sewerage and farm wastes. Here, a portable luminescence spectrophotometer was used to investigate if this technology could be used to provide both field scientists with a rapid pollution monitoring tool and process control engineers with a portable waste water monitoring device, through the measurement of river and waste water tryptophan-like fluorescence from a range of rivers in NE England and from effluents from within two waste water treatment plants. The portable spectrophotometer determined that waste waters and sewerage effluents had the highest tryptophan-like fluorescence intensity, urban streams had an intermediate tryptophan-like fluorescence intensity, and the upstream river samples of good water quality the lowest tryptophan-like fluorescence intensity. Replicate samples demonstrated that fluorescence intensity is reproducible to +/- 20% for low fluorescence, 'clean' river water samples and +/- 5% for urban water and waste waters. Correlations between fluorescence measured by the portable spectrophotometer with a conventional bench machine were 0.91; (Spearman's rho, n = 143), demonstrating that the portable spectrophotometer does correlate with tryptophan-like fluorescence intensity measured using the bench spectrophotometer.

  5. Double slit interferometry to measure the EUV refractive indices of solids using high harmonics.

    Science.gov (United States)

    Wilson, Lucy A; Rossall, Andrew K; Wagenaars, Erik; Cacho, Cephise M; Springate, Emma; Turcu, I C Edmond; Tallents, Greg J

    2012-04-20

    Accurate values of the extreme ultraviolet (EUV) optical properties of materials are required to make EUV optics such as filters and multilayer mirrors. The optical properties of aluminum studied in this report are required, in particular, as aluminum is used as an EUV filter material. The complex refractive index of solid aluminum and the imaginary part of the refractive index of solid iron between 17 eV and 39 eV have been measured using EUV harmonics produced from an 800 nm laser focused to 10(14) Wcm(2) in an argon gas jet impinging on a double slit interferometer.

  6. Objective evaluation of whiteness of cooked rice and rice cakes using a portable spectrophotometer.

    Science.gov (United States)

    Goto, Hajime; Asanome, Noriyuki; Suzuki, Keitaro; Sano, Tomoyoshi; Saito, Hiroshi; Abe, Yohei; Chuba, Masaru; Nishio, Takeshi

    2014-03-01

    The whiteness of cooked rice and rice cakes was evaluated using a portable spectrophotometer with a whiteness index (WI). Also, by using boiled rice for measurement of Mido values by Mido Meter, it was possible to infer the whiteness of cooked rice without rice cooking. In the analysis of varietal differences of cooked rice, 'Tsuyahime', 'Koshihikari' and 'Koshinokaori' showed high whiteness, while 'Satonoyuki' had inferior whiteness. The whiteness of rice cakes made from 'Koyukimochi' and 'Dewanomochi' was higher than the whiteness of those made from 'Himenomochi' and 'Koganemochi'. While there was a significant correlation (r = 0.84) between WI values and whiteness scores of cooked rice by the sensory test, no correlation was detected between the whiteness scores and Mido values, indicating that the values obtained by a spectrophotometer differ from those obtained by a Mido Meter. Thus, a spectrophotometer may be a novel device for measurement of rice eating quality.

  7. An ultraviolet-visible spectrophotometer automation system. Part 3: Program documentation

    Science.gov (United States)

    Roth, G. S.; Teuschler, J. M.; Budde, W. L.

    1982-07-01

    The Ultraviolet-Visible Spectrophotometer (UVVIS) automation system accomplishes 'on-line' spectrophotometric quality assurance determinations, report generations, plot generations and data reduction for chlorophyll or color analysis. This system also has the capability to process manually entered data for the analysis of chlorophyll or color. For each program of the UVVIS system, this document contains a program description, flowchart, variable dictionary, code listing, and symbol cross-reference table. Also included are descriptions of file structures and of routines common to all automated analyses. The programs are written in Data General extended BASIC, Revision 4.3, under the RDOS operating systems, Revision 6.2. The BASIC code has been enhanced for real-time data acquisition, which is accomplished by CALLS to assembly language subroutines. Two other related publications are 'An Ultraviolet-Visible Spectrophotometer Automation System - Part I Functional Specifications,' and 'An Ultraviolet-Visible Spectrophotometer Automation System - Part II User's Guide.'

  8. Shade determination using camouflaged visual shade guides and an electronic spectrophotometer.

    Science.gov (United States)

    Kvalheim, S F; Øilo, M

    2014-03-01

    The aim of the present study was to compare a camouflaged visual shade guide to a spectrophotometer designed for restorative dentistry. Two operators performed analyses of 66 subjects. One central upper incisor was measured four times by each operator; twice with a camouflaged visual shade guide and twice with a spectrophotometer Both methods had acceptable repeatability rates, but the electronic shade determination showed higher repeatability. In general, the electronically determined shades were darker than the visually determined shades. The use of a camouflaged visual shade guide seems to be an adequate method to reduce operator bias.

  9. Rising from the Dead: the Revival of the EUVE E/PO

    Science.gov (United States)

    Cullison, J. L.; Craig, N.; Stroozas, B. A.; Malina, R. F.

    2000-05-01

    NASA's Extreme Ultraviolet Explorer (EUVE) is dedicated to gathering data on our sky via instrumentation sensitive to the region of light between 76 and 760 angstroms. Since the all-sky survey was completed in 1993, astronomers have made studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they have learned about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation. In its pre-launch and early prime mission, EUVE had a thriving education and public outreach (E/PO) program formed expressly to spread the word on recent EUVE findings, but due to budgetary restraints in its extended mission, the project has been unable in recent years to support extensive E/PO efforts. Now in it's eighth year of operation, the EUVE Project has revived its E/PO efforts without significantly impacting its shoe-string budget. Web sites are being reconstructed, including sophisticated interactive learning environments where elementary through college level students, teachers, and the general public can select from lesson plans including, for example, an introductory astronomical module on the relationship between spectra and object classification, download three-dimensional cutouts of the EUVE skymap, view a slide show on the history and instrumentation of the satellite, take a virtual tour of the EUVE observatory, find where EUVE is in its orbit, and catch up on EUVE's most recent news and events. EUVE's revived internet E/PO presence is supplemented with staff and technical support (up to 10% of each staff person's time) of hands-on elementary and community projects coordinated by the UC Berkeley Center for Science Education (the now independent offshoot of the original EUVE E/PO). All elements of the EUVE E/PO are supported without impacting the efficient and highly productive science goals of the small-staffed mission. Additional EUVE E/PO efforts in the works include

  10. Carbon induced extreme ultraviolet (EUV) reflectance loss characterized using visible-light ellipsometry

    NARCIS (Netherlands)

    Chen, Juequan; Chen, Juequan; Louis, Eric; Louis, Eric; Wormeester, Herbert; Harmsen, Rob; van de Kruijs, Robbert Wilhelmus Elisabeth; Lee, Christopher James; van Schaik, Willem; Bijkerk, Frederik

    2011-01-01

    Carbon deposition on extreme ultraviolet (EUV) optics was observed due to photon-induced dissociation of hydrocarbons in a EUV lithography environment. The reflectance loss of the multilayer mirror is determined by the carbon layer thickness and density. To study the influence of various forms of

  11. EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror

    NARCIS (Netherlands)

    Huang, Qiushi; Louis, Eric; Bijkerk, Frederik; de Boer, Meint J.; von Blanckenhagen, G.

    2016-01-01

    A multilayer mirror (M) reflecting extreme ultraviolet (EUV) radiation from a first wave-length range in a EUV spectral region comprises a substrate (SUB) and a stack of layers (SL) on the substrate, the stack of layers comprising layers comprising a low index material and a high index material, the

  12. PMAS: The Potsdam Multi-Aperture Spectrophotometer. II. The Wide Integral Field Unit PPak

    NARCIS (Netherlands)

    Kelz, Andreas; Verheijen, Marc A. W.; Roth, Martin M.; Bauer, Svend M.; Becker, Thomas; Paschke, Jens; Popow, Emil; Sánchez, Sebastian F.; Laux, Uwe

    2006-01-01

    PPak is a new fiber-based integral field unit (IFU) developed at the Astrophysical Institute of Potsdam and implemented as a module into the existing Potsdam Multi-Aperture Spectrophotometer (PMAS) spectrograph. The purpose of PPak is to provide an extended field of view with a large

  13. Spectrophotometer and ultrasound evaluation of late toxicity following breast-cancer radiotherapy.

    Science.gov (United States)

    Yoshida, E J; Chen, H; Torres, M A; Curran, W J; Liu, T

    2011-10-01

    Radiation-induced normal-tissue toxicities are common, complex, and distressing side effects that affect 90% of patients receiving breast-cancer radiotherapy and 40% of patients post radiotherapy. In this study, the authors investigated the use of spectrophotometry and ultrasound to quantitatively measure radiation-induced skin discoloration and subcutaneous-tissue fibrosis. The study's purpose is to determine whether skin discoloration correlates with the development of fibrosis in breast-cancer radiotherapy. Eighteen breast-cancer patients were enrolled in our initial study. All patients were previously treated with a standard course of radiation, and the median follow-up time was 22 months. The treated and untreated breasts were scanned with a spectrophotometer and an ultrasound. Two spectrophotometer parameters-melanin and erythema indices-were used to quantitatively assess skin discoloration. Two ultrasound parameters-skin thickness and Pearson coefficient of the hypodermis-were used to quantitatively assess severity of fibrosis. These measurements were correlated with clinical assessments (RTOG late morbidity scores). Significant measurement differences between the treated and contralateral breasts were observed among all patients: 27.3% mean increase in skin thickness (p spectrophotometer parameters do not correlate with ultrasound parameters. Spectrophotometry and quantitative ultrasound are objective tools that assess radiation-induced tissue injury. Spectrophotometer parameters did not correlate with those of quantitative ultrasound suggesting that skin discoloration cannot be used as a marker for subcutaneous fibrosis. These tools may prove useful for the reduction of radiation morbidities and improvement of patient quality of life.

  14. [An optical-fiber-sensor-based spectrophotometer for soil non-metallic nutrient determination].

    Science.gov (United States)

    He, Dong-xian; Hu, Juan-xiu; Lu, Shao-kun; He, Hou-yong

    2012-01-01

    In order to achieve rapid, convenient and efficient soil nutrient determination in soil testing and fertilizer recommendation, a portable optical-fiber-sensor-based spectrophotometer including immersed fiber sensor, flat field holographic concave grating, and diode array detector was developed for soil non-metallic nutrient determination. According to national standard of ultraviolet and visible spectrophotometer with JJG 178-2007, the wavelength accuracy and repeatability, baseline stability, transmittance accuracy and repeatability measured by the prototype instrument were satisfied with the national standard of III level; minimum spectral bandwidth, noise and excursion, and stray light were satisfied with the national standard of IV level. Significant linear relationships with slope of closing to 1 were found between the soil available nutrient contents including soil nitrate nitrogen, ammonia nitrogen, available phosphorus, available sulfur, available boron, and organic matter measured by the prototype instrument compared with that measured by two commercial single-beam-based and dual-beam-based spectrophotometers. No significant differences were revealed from the above comparison data. Therefore, the optical-fiber-sensor-based spectrophotometer can be used for rapid soil non-metallic nutrient determination with a high accuracy.

  15. Authentic Performance in the Instrumental Analysis Laboratory: Building a Visible Spectrophotometer Prototype

    Science.gov (United States)

    Wilson, Mark V.; Wilson, Erin

    2017-01-01

    In this work we describe an authentic performance project for Instrumental Analysis in which students designed, built, and tested spectrophotometers made from simple components. The project addressed basic course content such as instrument design principles, UV-vis spectroscopy, and spectroscopic instrument components as well as skills such as…

  16. An Improved Flame Test for Qualitative Analysis Using a Multichannel UV-Visible Spectrophotometer

    Science.gov (United States)

    Blitz, Jonathan P.; Sheeran, Daniel J.; Becker, Thomas L.

    2006-01-01

    Qualitative analysis schemes are used in undergraduate laboratory settings as a way to introduce equilibrium concepts and logical thinking. The main component of all qualitative analysis schemes is a flame test, as the color of light emitted from certain elements is distinctive and a flame photometer or spectrophotometer in each laboratory is…

  17. Measurements and Modeling of Heliospheric EUV Spectral Irradiance and Luminosity

    Science.gov (United States)

    Floyd, L. E.; McMullin, D. R.; Auchere, F.

    2012-12-01

    For more than 15 years, The EIT and the later EUVI instruments aboard SoHO and STEREO, respectively, have provided a time series of images of the solar radiance in the HeII 30.4 nm transition region and three coronal emission lines (FeIX/X, FeXII, and FeXV) of differing temperatures. While the EIT measurements were gathered from a position very near to the Earth-Sun axis, the EUVI measurements were gathered at angles ranging up to and in excess of ±90 degrees in solar longitude from the Earth-Sun axis. Using a Differential Emission Measure (DEM) model, these measurements provide the basis for estimates of the spectral irradiance for the entire solar spectrum up to about 50 nm at any position in the heliosphere. These spectra are utilized in this work for two purposes. First, the photoionization rate of neutral He at each position is calculated. Neutral He is of interest because it traverses the heliopause relatively undisturbed and therefore provides a measure of isotopic parameters beyond the heliosphere. Second, we use these generate a time series of estimates of the solar EUV spectral luminosity extending from the recent post Solar Cycle 23 minimum into the current unusually weak rise of Solar Cycle 24. Because this EUV spectral luminosity is the sum of all solar radiation at each wavelength in every direction, their time series should not contain any systematic 27-day solar rotation periodicities as do typical solar activity indices and its presence would be an indication of time series reliability. This EUV luminosity time series is compared with other solar indices such as SSN and the F10.7 radio flux.

  18. Mirror contamination and secondary electron effects during EUV reflectivity analysis

    Science.gov (United States)

    Catalfano, M.; Kanjilal, A.; Al-Ajlony, A.; Harilal, S. S.; Hassanein, A.; Rice, B.

    2012-03-01

    We investigated Ru mirror contamination and subsequent EUV reflectivity loss using the IMPACT facility at Purdue University. Because Ru can either be used as a grazing mirror or as a capping layer for multilayer normal mirror, we examined the angular dependency of XPS peak area intensity at the O 1s and Ru 3d regions as well as the effects of sputtering. Although no change in intensity has been observed at lower take-off angles from the target surface, the peak area intensity starts changing with increasing θ (i.e., emission observation angle, representing the angle between the target surface plane and detector entrance). Among different components, the effect of water and oxidized carbon are found to be most notable when viewed at lower θ, and primarily responsible for degrading the reflectivity of the Ru layer. On the other hand, the effect of OH becomes dominant with increasing observation angle θ, and thus plays a key role to suppress optical transmission. Moreover, atomic carbon effect is found to peak when observed at 30°, and most likely plays an important role in degrading both reflectivity and transmission. This is also because of the total photon path length in the Ru film at different angles. During the contamination process, the EUV reflectivity of the Ru film is found to significantly degrade in the presence of additional secondary electrons from the focusing Ru mirror of the EUV setup. This effect could be explained in the light of a competition between oxidation and carbonization processes on Ru surface.

  19. EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

    Science.gov (United States)

    Putna, E. Steve; Younkin, Todd R.; Leeson, Michael; Caudillo, Roman; Bacuita, Terence; Shah, Uday; Chandhok, Manish

    2011-04-01

    The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. According to recent assessments made at the 2010 EUVL Symposium, the readiness of EUV materials remains one of the top risk items for EUV adoption. The main development issue regarding EUV resists has been how to simultaneously achieve high resolution, high sensitivity, and low line width roughness (LWR). This paper describes our strategy, the current status of EUV materials, and the integrated post-development LWR reduction efforts made at Intel Corporation. Data collected utilizing Intel's Micro- Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <=11.3mJ/cm2 with <=3nm LWR.

  20. Surface modification by EUV laser beam based on capillary discharge

    Czech Academy of Sciences Publication Activity Database

    Frolov, Oleksandr; Koláček, Karel; Schmidt, Jiří; Štraus, Jaroslav; Prukner, Václav; Shukurov, A.

    -, č. 58 (2011), s. 484-487 ISSN 2010-376X. [International Conference on Fusion and Plasma Physics. Bali, Indonésie, 26.10.2011-28.10.2011] R&D Projects: GA AV ČR KAN300100702; GA MŠk LA08024; GA MŠk(CZ) LC528 Institutional research plan: CEZ:AV0Z20430508 Keywords : soft x-ray * EUV * laser * radiation * source * capillary * discharge * plasma * ablation * surface modification Subject RIV: BL - Plasma and Gas Discharge Physics http://www.waset.org/journals/waset/v58/v58-99.pdf

  1. Imaging Grating SpectroPhotometer (I-GRASP) for Solar Soft X-Ray Spectra and Images from a Cube Sat Mission

    Science.gov (United States)

    Didkovsky, Leonid V.; Wieman, Seth; Woods, Thomas N.; Jones, Andrew; Chao, Weilun

    2016-05-01

    We describe the Soft X-ray Imaging Grating SpectroPhotometer (I-GRASP), a novel spectrophotometer with four times narrower transmission grating period (about 50 nm) compared to the MIT-designed 200 nm gratings successfully used for the SOHO/SEM, the SDO/EVE/ESP, and the Solar Aspect Monitor (SAM) onboard the EVE sounding rocket suite of instruments. The new grating is based on technology developed at the Lawrence Berkeley National Laboratory (LBNL) and provides four to five time greater diffraction dispersion than the 200 nm period gratings. Such new technology will provide detection of both 0.1 nm - resolved solar spectra in about 1.0 to 7.0 nm spectral range and a soft X-ray pin-hole solar image from the I-GRASP instrument that is appropriately sized for a CubeSat platform. The solar observations of this soft X-ray range do not currently have spectral resolution, so I-GRASP concurrent spectral and imaging X-ray observations will be important for:Improvements in modeling of coronal dynamics and heating by comparing measured and modeled spectra through identifying changes in abundances from different active regions- Resolving some differences in certain iron spectral line intensity ratios observed with SAM, identifying key emission lines, and comparing to those modeled with the CHIANTI atomic database- Studying SXR spectral variability for different solar activity periods including solar flares and the 27-day solar rotation- Studying of the Earth’s ionosphere, thermosphere and mesosphere responses using as input the detailed soft X-ray spectra from I-GRASP- Improving solar soft X-ray reference spectra for accurate calculations of absolute solar irradiance from the SDO/EVE/ESP, SDO/EVE/SAM, TIMED/SEE/XPS, and SORCE/XPS channels that have broadband measurements of the 1-7 nm band- Providing validation for the soft X-Ray observations from the MinXSS CubeSat X123 spectrometer (0.04 to 2.5 nm) with the I-GRASP spectral observations from 1.0 to 7.0 nm- Comparing I

  2. Evaluation of ESP Teachers in Different Contexts of Iranian Universities

    OpenAIRE

    Maryam Sherkatolabbasi; Amir Mahdavi-Zafarghandi

    2012-01-01

    In countries where English is mainly used for academic purposes, such as Iran, ESP plays a highly important role. In Iran, there are three major different contexts of ESP in which content teachers, language teachers, and professional ESP teachers at Language Departments of each discipline teach ESP. The present study intends to evaluate teachers in the three mentioned ESP contexts at several Iranian universities such as Shahid Beheshti, Esfahan, and Guilan Universities. For this purpose, at t...

  3. ESP Practitioner Professionalization through Apprenticeship of Practice: The Case of Two Iranian ESP Practitioners

    Science.gov (United States)

    Ghanbari, Batoul; Rasekh, Abbas Eslami

    2012-01-01

    English for specific purposes (ESP), the popular catchphrase of presently English language teaching programs, has been investigated from different perspectives. However, there have been occasional forays in to the role of ESP practitioner as one of the most distinctive features in the literature. In addition to fulfilling the usual role of a…

  4. Metrology tools for EUV-source characterization and optimization

    Science.gov (United States)

    Missalla, Thomas; Schuermann, Max C.; Lebert, Rainer; Wies, Christian; Juschkin, Larissa; Klein, Roman M.; Scholze, Frank; Ulm, Gerhard; Egbert, Andre; Tkachenko, Boris; Chichkov, Boris N.

    2004-05-01

    The development of suitable radiation sources for extreme ultraviolet lithography (EUVL) is a major challenge. For the optimization of these sources and for the determination of the parameters needed for the system design and the system integration these sources have to be characterized in terms of the absolute in-band power, the spectral distribution in the EUV spectral region and the out-of-band spectral regions, the spatial distribution of the emitting volume and the angular distribution of the emission. For improving the lifetime of such sources, generally accepted as one key risk with EUVL, another task, the debris emitted from sources under development has to be investigated. Therefore, JENOPTIK Mikrotechnik GmbH is co-operating with the Laser Laboratorium Goettingen, the Physikalisch-Technische Bundesanstalt (PTB) and the AIXUV GmbH in developing ready-for-use metrology tools for EUVL source characterization and optimization. The set of the tools employed for EUV-source characterization is presented in detail as well as concepts for calibration and measurement procedures.

  5. Optical, UV, and EUV Oscillations of SS Cygni in Outburst

    Energy Technology Data Exchange (ETDEWEB)

    Mauche, C W

    2003-12-19

    I provide a review of observations in the optical, UV (HST), and EUV (EUVE and Chandra LETG) of the rapid periodic oscillations of nonmagnetic, disk-accreting, high mass-accretion rate cataclysmic variables (CVs), with particular emphasis on the dwarf nova SS Cyg in outburst. In addition, I drawn attention to a correlation, valid over nearly six orders of magnitude in frequency, between the frequencies of the quasi-periodic oscillations (QPOs) of white dwarf, neutron star, and black hole binaries. This correlation identifies the high frequency quasi-coherent oscillations (so-called ''dwarf nova oscillations'') of CVs with the kilohertz QPOs of low mass X-ray binaries (LMXBs), and the low frequency and low coherence QPOs of CVs with the horizontal branch oscillations (or the broad noise component identified as such) of LMXBs. Assuming that the same mechanisms produce the QPOs of white dwarf, neutron star, and black hole binaries, this correlation has important implications for QPO models.

  6. Static and dynamic photoresist shrinkage effects in EUV photoresists

    Science.gov (United States)

    Bunday, Benjamin; Montgomery, Cecilia; Montgomery, Warren; Cordes, Aaron

    2012-03-01

    Photoresist shrinkage (a.k.a. line slimming) is an important systematic uncertainty source in critical dimension-scanning electron microscope (CD-SEM) metrology of lithographic features [1][2][3][4][5]. In terms of metrology gauge metrics, it influences both the precision and the accuracy of CD-SEM measurements, while locally damaging the sample. Minimization or elimination of shrinkage is desirable, yet elusive. This error source will furthermore be a factor in CDSEM metrology on such polymer materials into the era of EUV lithography, such that learning to work around this issue will continue to be necessary. Recent work has demonstrated improved understanding of the trends in the shrinkage response depending on electron beam and target parameters in the static measurement case [2][3][4][5][6]. Another recent work has highlighted a second mode of shrinkage that is apparent over time and progresses as a function of time between consecutive measurements, a form of "dynamic shrinkage" that appears to be activated by electron beam, in which the activated feature perpetually and logarithmically shrinks [7][8]. In this work, we will explore both the static and dynamic shrinkage behaviors of various EUV photoresists. The static shrinkage behaviors will be tested for compliance with the SEMATECH shrinkage model [5][6], and further studies will confirm whether or not the dynamic effects are observable. Knowledge of secondary trends in dynamic shrinkage will also be further explored, including how these vary with electron beam energy, activation dose, feature size, and other parameters.

  7. The EUV Emission in Comet-Solar Corona Interactions

    Science.gov (United States)

    Bryans, Paul; Pesnell, William Dean; Schrijver, Carolus J.; Brown, John C.; Battams, Karl; Saint-Hilaire, Pasal; Liu, Wei; Hudson, Hugh S.

    2011-01-01

    The Atmospheric Imaging Assembly (AlA) on the Solar Dynamics Observatory (SDO) viewed a comet as it passed through the solar corona on 2011 July 5. This was the first sighting of a comet by a EUV telescope. For 20 minutes, enhanced emission in several of the AlA wavelength bands marked the path of the comet. We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Water ice in the comet rapidly sublimates as it approaches the Sun. This water vapor is then photodissociated, primarily by Ly-alpha, by the solar radiation field to create atomic Hand O. Other molecules present in the comet also evaporate and dissociate to give atomic Fe and other metals. Subsequent ionization of these atoms can be achieved by a number of means, including photoionization, electron impact, and charge exchange with coronal protons and other highly-charged species. Finally, particles from the cometary atmosphere are thermalized to the background temperature of the corona. Each step could cause emission in the AlA bandpasses. We will report here on their relative contribution to the emission seen in the AlA telescopes.

  8. Overcoming etch challenges related to EUV based patterning (Conference Presentation)

    Science.gov (United States)

    Metz, Andrew W.; Cottle, Hongyun; Honda, Masanobu; Morikita, Shinya; Kumar, Kaushik A.; Biolsi, Peter

    2017-04-01

    Research and development activities related to Extreme Ultra Violet [EUV] defined patterning continue to grow for plasma etch trade-offs related to traditional approaches of PR smoothing, descum implementation and maintaining 2D aspect ratios of short lines or elliptical contacts concurrent with ultra-high photo resist [PR] selectivity. In this paper we will discuss sources of LER/LWR, impact of material choice, integration, and innovative plasma process techniques and describe how TELTM VigusTM CCP Etchers can enhance PR selectivity, reduce LER/LWR, and maintain 2D aspect ratio of incoming patterns. Beyond traditional process approaches this paper will show the utility of: [1] DC Superposition in enhancing EUV resist hardening and selectivity, increasing resistance to stress induced PR line wiggle caused by CFx passivation, and mitigating organic planarizer wiggle; [2] Quasi Atomic Layer Etch [Q-ALE] for ARC open eliminating the tradeoffs between selectivity, CD, and shrink ratio control; and [3] ALD+Etch FUSION technology for feature independent CD shrink and LER reduction. Applicability of these concepts back transferred to 193i based lithography is also confirmed.

  9. Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining

    Science.gov (United States)

    Makimura, Tetsuya; Torii, Shuichi; Okazaki, Kota; Nakamura, Daisuke; Takahashi, Akihiko; Niino, Hiroyuki; Okada, Tatsuo; Murakami, Kouichi

    2011-06-01

    We have investigated responses of PDMS, PMMA and acrylic block copolymers (BCP) to EUV light from laserproduced plasma beyond ablation thresholds and micromachining. We generated wide band EUV light around 100 eV by irradiation of Ta targets with Nd:YAG laser light. In addition, narrow band EUV light at 11 and 13 nm were generated by irradiation of solid Xe and Sn targets, respectively, with pulsed CO2 laser light. The generated EUV light was condensed onto samples, using an ellipsoidal mirror. The EUV light was incident through windows of contact masks on the samples. We found that through-holes with a diameter of 1 μm can be fabricated in PDMS sheets with thicknesses of 10 μm. PDMS sheets are ablated if they are irradiated with EUV light beyond a threshold power density, while PDMS surfaces were modified by irradiation with the narrow band EUV light at lower power densities. Effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals using the practical apparatus. Furthermore, BCP sheets were ablated to have micro-structures. Thus, we have developed a practical technique for microma chining of PMMA, PDMS and BCP sheets in a micrometer scale.

  10. Physical and chemical modifications of PET surface using a laser-plasma EUV source

    Science.gov (United States)

    Bartnik, A.; Fiedorowicz, H.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Biliński, A.; Chernyayeva, O.; Sobczak, J. W.

    2010-06-01

    Extreme ultraviolet (EUV) radiation is the electromagnetic radiation ranging from vacuum ultraviolet to soft X-rays. A single EUV photon carries enough energy to ionize any atom or molecule. The penetration depth of the radiation in any material is very short, ranging from tens to hundreds nanometers. Intense EUV pulses can remove material from the surface or modify its morphology or/and chemical structure. In this work, the radiation from a laser-plasma EUV source based on a double-stream gas-puff target was used for surface modification of polyethylene terephthalate (PET). The PET samples were irradiated with the EUV pulses emitted from krypton plasma and focused with a gold-plated ellipsoidal collector. The spectrum of the focused radiation covered the wavelength range from 9 to 70 nm. The PET samples were irradiated for 1 s-2 min at a 10-Hz repetition rate. Surface morphology of polymer samples after irradiation was investigated using a scanning electron microscope. Changes in chemical surface structure of the irradiated samples were investigated using an X-ray photoelectron spectroscopy. Different kinds of surface microstructures were obtained depending on the EUV fluence in a single pulse and the total EUV fluence. XPS measurements also revealed a modification of the chemical structure.

  11. Effects of plasma spatial profile on conversion efficiency of laser produced plasma sources for EUV lithography

    Science.gov (United States)

    Hassanein, A.; Sizyuk, V.; Sizyuk, T.; Harilal, S.

    2009-03-01

    Extreme ultraviolet (EUV) lithography devices that use laser produced plasma (LPP), discharge produced plasma (DPP), and hybrid devices need to be optimized to achieve sufficient brightness with minimum debris generation to support the throughput requirements of High-Volume Manufacturing (HVM) lithography exposure tools with long lifetime. Source performance, debris mitigation, and reflector system are all critical to efficient EUV collection and component lifetime. Enhanced integrated models are continued to be developed using HEIGHTS computer package to simulate EUV emission at high power and debris generation and transport in multiple and colliding LPP. A new center for materials under extreme environments (CMUXE) is established to benchmark HEIGHTS models for various EUV related issues. The models being developed and enhanced include, for example, new ideas and parameters of multiple laser beams in different geometrical configurations and with different pre-pulses to maximize EUV production. Recent experimental and theoretical work show large influence of the hydrodynamic processes on EUV generation. The effect of plasma hydrodynamics evolution on the EUV radiation generation was analyzed for planar and spherical geometry of a tin target in LPP devices. The higher efficiency of planar target in comparison to the spherical geometry was explained with better hydrodynamic containment of the heated plasma. This is not the case if the plasma is slightly overheated. Recent experimental results of the conversion efficiency (CE) of LPP are in good agreement with HEIGHTS simulation.

  12. Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN

    Science.gov (United States)

    Rajendran, Rajeev; Mochi, Iacopo; Helfenstein, Patrick; Mohacsi, Istvan; Redford, Sophie; Mozzanica, Aldo; Schmitt, Bernd; Yoshitake, Shushuke; Ekinci, Yasin

    2017-03-01

    With extreme ultraviolet (EUV) lithography getting ready to enter high volume manufacturing, there is an imminent need to address EUV mask metrology infrastructure. Actinic defect inspection of patterned EUV photomasks has been identified as an essential step for mask qualification, but there is no commercial tool available right now. We address this gap with the RESCAN tool, a defect inspection platform being built at Paul Scherrer Institut (PSI), co-developed in collaboration with Nuflare Inc, Japan. RESCAN uses Scanning Scattering Contrast Microscopy (SSCM) and Scanning Coherent Diffraction Imaging (SCDI) for fast defect detection and fine defect localization. The development of a stand-alone tool based on these techniques relies on the availability of (1) a bright coherent EUV source with a small footprint and (2) a high frame-rate pixel detector with extended dynamic range and high quantum efficiency for EUV. We present two in-house projects at PSI addressing the development of these components: COSAMI and JUNGFRAU. COSAMI (COmpact Source for Actinic Mask Inspection), is a high-brightness EUV source optimized for EUV photons with a relatively small footprint. JUNGFRAU (adJUstiNg Gain detector FoR the Aramis User station) is a silicon-based hybrid pixel detector, developed in house at PSI and prototyped for EUV. With a high frame rate and dynamic range at 13.5 nm, this sensor solution is an ideal candidate for the RESCAN platform. We believe that these ongoing source and sensor programs will pave the way towards a comprehensive solution for actinic patterned mask inspection bridging the gap of actinic defect detection and identification on EUV reticles.

  13. [Determination of aluminum in sediments by atomic absorption spectrophotometer without FIA spectrophotometric analysis].

    Science.gov (United States)

    Zhao, Zhen-yi; Han, Guang-xi; Song, Xi-ming; Luo, Zhi-xiong

    2008-06-01

    To search for a new method of determining, we developed a new flow injection analyzer, applied to the atomic absorption spectrophotometer, relying on it without flame in place of visible spectrophotometer, and studied the appropriate condition for the determination of aluminum in sediments, thus built up a kind of new analytical test technique. Three peak and two valley absorption values (A1, A2, A3, A4 and A5) can be continuously obtained simultaneously that all can be used for quantitative analysis, then we discussed its theory and experiment technique. Based on the additivity of absorbance (A = A1+A2+A3+A4+ A5), the sensitivity of FIA is enhanced, and its precision and linear relation are also good, raising the efficiency of AAS. The simple method has been applied to determining Al in sediments, and the results are satisfactory.

  14. Differences between the human eye and the spectrophotometer in the shade matching of tooth colour.

    Science.gov (United States)

    Gómez-Polo, Cristina; Gómez-Polo, Miguel; Celemin-Viñuela, Alicia; Martínez Vázquez De Parga, Juan Antonio

    2014-06-01

    The aim of this work was to assess the agreement between instrumental and visual colour matching. Shade selection with the 3DMaster Toothguide (Vita-Zahnfabrik) was performed for 1361 maxillary central incisors and compared with the shade obtained with the EasyShade Compact (Vita-Zahnfabrik) spectrophotometer. We observed a greater correlation between the objective method and the subjective one in the colour dimension of lightness (Kappa 0.6587), followed by hue (Kappa 0.4337) and finally chroma (Kappa 0.3578). The colour dimension in which the greatest agreement is seen between the operator and the spectrophotometer is value or lightness. This study reveals differences between the measurement of colour via spectrophotometry and the visual shade selection method. According to our results, there is better agreement in the value or lightness colour dimension, which is the most important one in the choice of tooth colour. Copyright © 2014 Elsevier Ltd. All rights reserved.

  15. QUALITY IMPROVEMENT OF ESP IN MECHANICAL ENGINEERING

    Directory of Open Access Journals (Sweden)

    Alina-Andreea Dragoescu

    2010-09-01

    Full Text Available The latest political positioning of Serbia has caused many changes in the society with the most dramatic economic shift on the market. The market requires young educated employees with special additional "soft skills". This has resulted in the need to change the Serbian educational system with the Bologna process implemented. Therefore, the syllabus of ESP in Mechanical Engineering must be adjusted to the demands as regards needs analysis so that it can meet the requirements of the rapidly growing market. This paper offers an outline of ESP syllabus which can be regularly updated with respect to technological and other changes on the market.

  16. Using aberration test patterns to optimize the performance of EUV aerial imaging microscopes

    Energy Technology Data Exchange (ETDEWEB)

    Mochi, Iacopo; Goldberg, Kenneth A.; Miyakawa, Ryan; Naulleau, Patrick; Han, Hak-Seung; Huh, Sungmin

    2009-06-16

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a prototype EUV-wavelength zoneplate microscope that provides high quality aerial image measurements of EUV reticles. To simplify and improve the alignment procedure we have created and tested arrays of aberration-sensitive patterns on EUV reticles and we have compared their images collected with the AIT to the expected shapes obtained by simulating the theoretical wavefront of the system. We obtained a consistent measure of coma and astigmatism in the center of the field of view using two different patterns, revealing a misalignment condition in the optics.

  17. Fiberoptic spectrophotometer

    Science.gov (United States)

    Tans, Petrus P.; Lashof, Daniel A.

    1986-01-01

    A device for determining the relative composition of a sample of a gas by comparison of the Raman-scattered light of the sample with that of a known gas comprising: a means for passing a single light source through the unknown and the known gases, choppers to alternate the Raman-scattered light into a common light detection and measuring system, optical fiber networks for spatially mixing the resulting Raman scattered light from each sample and directing the mixed light to selective detectors, and a compiler to record the light intensity of each wavelength of Raman-scattered light as a function of the sample from which it originated.

  18. Palmtop spectrophotometer for DNA and protein measurement in micro-nanoliter assays

    Science.gov (United States)

    Qiu, Tian; Huang, Guoliang; Yang, Xiaoyong; Ma, Li; Yang, Xu

    2011-01-01

    Spectrophotometer, an important tool in life science, medicine, and analytical fields, usually uses an optical path of 10 mm or more for absorbance measurement of UV light. This corresponds to a sample consumption of >= 50 μL in volume and a narrow measuring range of 0.5-50 ng/μL for nucleic acid samples and 0.05-2 mg/mL for protein samples. Higher concentrations must be diluted for measurement. In this paper, we developed an advanced palmtop spectrophotometer for the measurement of both DNA and protein concentrations in micro-nanoliter assays. We constructed a fiber transmission and a fiber reflection absorbance detection scheme illuminated by either UV-LED or deuterium lamp. The sensitivity of 0.5 ng/μL and a wide measuring range of 0.5-2000 ng/μL in concentrations were obtained for DNA, and the sensitivity of 0.05 mg/mL and a wide measuring range of 0.05-100 mg/mL were also obtained for protein. However, sample consumption is only 1 μL in volume for fiber transmission detection scheme and 500 nL for fiber reflection detection scheme. The linear correlation coefficient of measured concentrations to theoretical concentrations is greater than 0.99. With the profit of this work, a miniaturized spectrophotometer with better sensitivity and wider measuring range can be produced for analytical applications.

  19. Chemical Fouling Reduction of a Submersible Steel Spectrophotometer in Estuarine Environments Using a Sacrificial Zinc Anode.

    Science.gov (United States)

    Tait, Zachary S; Thompson, Megan; Stubbins, Aron

    2015-07-01

    The availability of in situ spectrophotometers, such as the S::CAN spectro::lyser, has expanded the possibilities for high-frequency water quality data collection. However, biological and chemical fouling can degrade the performance of in situ spectrophotometers, especially in saline environments with rapid flow rates. A complex freshwater washing system has been previously designed to reduce chemical fouling for the S::CAN spectro::lyser spectrophotometer. In the current study, we present a simpler, cheaper alternative: the attachment of a sacrificial zinc anode. Results are presented detailing the S::CAN spectro::lyser performance with and without the addition of the sacrificial anode. Attachment of the zinc anode provided efficient corrosion protection during 2-wk deployments in a highly dynamic (average tidal range, 2.5 m) saline tidal saltmarsh creek at Groves Creek, Skidaway Institute of Oceanography, Savannah, GA. Copyright © by the American Society of Agronomy, Crop Science Society of America, and Soil Science Society of America, Inc.

  20. Correlation between skin color evaluation by skin color scale chart and narrowband reflectance spectrophotometer.

    Science.gov (United States)

    Treesirichod, Arucha; Chansakulporn, Somboon; Wattanapan, Pattra

    2014-07-01

    Various methods are available for the evaluation of skin color. A skin color scale chart is a convenient and inexpensive tool. However, the correlation between a skin color scale chart and objective measurement has not been evaluated. To assess the correlation between skin color evaluation done by a skin color scale chart (Felix von Luschan skin color chart) and a narrowband reflectance spectrophotometer (Mexameter MX18). The participants were evaluated for skin color by using the Felix von Luschan skin color chart (range 1-36) and a narrowband reflectance spectrophotometer (Mexameter MX18) in which the results of the measurements were expressed as Erythema (E) and Melanin (M) indices. Skin color was measured on four different anatomical skin sites from each participant on the medial aspect of the volar and the dorsal regions of both forearms. A total of 208 records from 52 participants were established. The majority of participants (19.2%) were rated with the skin color scale at the number 16 (range 14-33). The mean M plus E, M, and E indices were 498.9 ± 143.9, 230.4 ± 74.4, and 268.5 ± 73.2, respectively. The correlation coefficient between the number on the skin color scale and each index: M plus E, M, and E indices were 0.90, 0.90, and 0.86, respectively, with a statistical significance of P spectrophotometer.

  1. Etch bias inversion during EUV mask ARC etch

    Science.gov (United States)

    Lajn, Alexander; Rolff, Haiko; Wistrom, Richard

    2017-07-01

    The introduction of EUV lithography to high volume manufacturing is now within reach for 7nm technology node and beyond (1), at least for some steps. The scheduling is in transition from long to mid-term. Thus, all contributors need to focus their efforts on the production requirements. For the photo mask industry, these requirements include the control of defectivity, CD performance and lifetime of their masks. The mask CD performance including CD uniformity, CD targeting, and CD linearity/ resolution, is predominantly determined by the photo resist performance and by the litho and etch processes. State-of-the-art chemically amplified resists exhibit an asymmetric resolution for directly and indirectly written features, which usually results in a similarly asymmetric resolution performance on the mask. This resolution gap may reach as high as multiple tens of nanometers on the mask level in dependence of the chosen processes. Depending on the printing requirements of the wafer process, a reduction or even an increase of this gap may be required. A potential way of tuning via the etch process, is to control the lateral CD contribution during etch. Aside from process tuning knobs like pressure, RF powers and gases, which usually also affect CD linearity and CD uniformity, the simplest knob is the etch time itself. An increased over etch time results in an increased CD contribution in the normal case. , We found that the etch CD contribution of ARC layer etch on EUV photo masks is reduced by longer over etch times. Moreover, this effect can be demonstrated to be present for different etch chambers and photo resists.

  2. Investigation of alternate mask absorbers in EUV lithography

    Science.gov (United States)

    Burkhardt, Martin

    2017-03-01

    In order to succeed with such low-k1 lithography at EUV wavelength, we need to be able to print a grating at high contrast similar to ArF immersion tools, where a contrast exceeding 0.95 is achieved routinely. All 2d printing is composed of interference of x and y-directed diffraction orders and high contrast in 2d thus depends on such 1d grating contrast. Any low-k1 imaging will use either dipole or some other sort of extreme off-axis illumination such as cross-quad (cQuad). The two relevant magnitudes for any high contrast are the intrinsic contrast due to a monopole, and the spatial shift of the two images that are generated by the two monopoles making up the dipole exposure. In EUV with current absorbers, high contrast can currently only be achieved using monopole illumination, a technique that does not lend itself to process integration due to removal of wafer side telecentricity and resulting overlay problems at all but preferred pitch. For dipole illumination at low-k1 pitches, we collect only 0th order light and only one 1st diffracted order for each pole. This means that for a dipole at the resolution limit, the final image for horizontal l/s patterns consists of only four incident waves, one TE and one TM wave for each of the poles. In this paper, we screen absorber by n and k values. In the process, we introduce phasor notation in order to gain insight into the behavior of the absorber and try to understand the metrics. We investigate intrinsic contrast and image blur due to monopole image shift.

  3. ESP: Teaching English for Specific Purposes.

    Science.gov (United States)

    Schleppegrell, Mary; Bowman, Brenda

    This manual is a guide to the development of an instructional program in English for Specific Purposes (ESP). Step-by-step procedures for assessing student needs, setting achievable goals, designing a program, and selecting appropriate materials and activities for the classroom are outlined. The four language skills (listening, reading, speaking,…

  4. ESP within a New Descriptive Framework.

    Science.gov (United States)

    Markee, Numa

    1989-01-01

    Defines and introduces four language planning terms (status planning, corpus planning, policy planning, and language cultivation) into the English for Specific Purposes (ESP) literature. The utility of these terms as descriptors for the language teaching problem-solving process is exemplified with reference to two language problems encountered by…

  5. EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

    Science.gov (United States)

    Putna, E. Steve; Younkin, Todd R.; Chandhok, Manish; Frasure, Kent

    2009-03-01

    The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 32nm half-pitch node and beyond. Readiness of EUV materials is currently one high risk area according to assessments made at the 2008 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data is presented utilizing Intel's Micro-Exposure Tool (MET) examining the feasibility of establishing a resist process that simultaneously exhibits <=30nm half-pitch (HP) L/S resolution at <=10mJ/cm2 with <=4nm LWR.

  6. The Variability and Spectrum of NGC 4051 from Deep, Simultaneous EUVE and XTE Observations

    Science.gov (United States)

    Fruscione, Antonella; Cagnoni, Ilaria; Papadakis, Iossif; McHardy, Ian

    1998-01-01

    We present timing and spectral analysis of the data collected by the Extreme Ultraviolet Explorer Satellite (EUVE) for the Seyfert 1 galaxy NGC 4051 during 1996. NGC 4051 was observed twice in May 1996 and again in December 1996 for a total of more than 200 ksec. The observations were always simultaneous with hard X-ray observations conducted with the X-Ray Timing Explorer (XTE). The EUVE light curves are extremely variable during each observation, with the maximum variability during May 1996 when we registered changes by a factor of 21 over 8 hours and more than a factor of 24 variations from peak to minimum. We detected signal in the EUVE spectrograph in the 75-100 Arange which is well fitted by absorbed power law models. We will illustrate the results of our spectral and detailed power spectrum analysis for the simultaneous EUVE and XTE spectra and light curves and discuss the consequences on possible emission mechanisms.

  7. PVO VENUS ELECT TMP PROBE RESAMP SOLAR EUV 24 HR AVG VER 1.0

    Data.gov (United States)

    National Aeronautics and Space Administration — The Solar EUV Daily Values File. This file gives the magnitude of the photoemission current from the radial probe, Ipe, (in units of 10-9 amps). Ipe dominates the...

  8. Hemispherical Nature of EUV Shocks Revealed by SOHO, STEREO, and SDO Observations

    Science.gov (United States)

    Gopalswamy, Natchimuthuk; Nitta, N.; Akiyama, S.; Makela, P.; Yashiro, S.

    2011-01-01

    EUV wave transients associated with type II radio bursts are manifestation of CME-driven shocks in the solar corona. We use recent EUV wave observations from SOHO, STEREO, and SDO for a set of CMEs to show that the EUV transients have a spherical shape in the inner corona. We demonstrate this by showing that the radius of the EUV transient on the disk observed by one instrument is approximately equal to the height of the wave above the solar surface in an orthogonal view provided by another instrument. The study also shows that the CME-driven shocks often form very low in the corona at a heliocentric distance of 1.2 Rs, even smaller than the previous estimates from STEREO/CORl data (Gopalswamy et aI., 2009, Solar Phys. 259, 227). These results have important implications for the acceleration of solar energetic particles by CMEs

  9. Photoelectron scattering and acid release in EUV lithography: a simulation study (Conference Presentation)

    Science.gov (United States)

    Biafore, John J.

    2017-03-01

    Abstract BACKGROUND: The ionizing wavelength in extreme ultraviolet (EUV) resist exposure leads to photoelectron scattering and uncertainty in the resulting acid image, producing line-edge roughness (LER) and poor CD uniformity of the printed features. GOALS: Try to determine how photoelectron and acid exposure blur effects affect EUV lithography and how they might be better controlled. Try to determine whether or not, and if so under what conditions, high resist quantum yields are beneficial to EUV lithography. METHODS: Using a stochastic resist simulator, we study the effects of resist properties upon photoelectric scattering, the uncertainty in the acid release and the properties of the after-development photoresist image in high NA EUV lithography. Uncertainty in the release of acids is the fundamental cause of LER and the ultimate limiter of optical lithography technology.

  10. Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

    KAUST Repository

    Kryask, Marie

    2013-01-01

    Hybrid nanoparticle photoresists and their patterning using DUV, EUV, 193 nm lithography and e-beam lithography has been investigated and reported earlier. The nanoparticles have demonstrated very high EUV sensitivity and significant etch resistance compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass loss and dissolution studies support the current model. © 2013SPST.

  11. Wavelength dependence of prepulse laser beams on EUV emission from CO2 reheated Sn plasma

    Science.gov (United States)

    Freeman, J. R.; Harilal, S. S.; Sizyuk, T.; Hassanein, A.; Rice, B.

    2012-03-01

    Extreme ultraviolet (EUV) emission from laser-produced plasmas (LPP) centered at 13.5 nm is considered a leading candidate for the light source in future lithography systems. Tin is currently the best material for generating this EUV emission since it emits strongly within the 13.5 nm region due to its various ionic states (Sn8+-Sn14+). Highly efficient and low-debris LPPs are a pre-requisite for their use as light sources for EUV lithography. Tin plasmas generate debris that can damage collection optics over time. Techniques to mitigate debris are needed to extend the lifetime of these components and the system. Optimization of plasma conditions is necessary for increasing EUV emission and enhancing conversion efficiency (CE). Improving the source CE is necessary in order to reduce the cost of ownership and hence, develop a commercially viable lithography system for the semiconductor industry. One method to accomplish this is to reheat pre-formed plasma with a laser pulse to enhance EUV emission. This enhancement is achieved by controlling those plasma conditions necessary for optimizing EUV emission. We investigated the role of prepulse laser wavelength on prepulse plume formation and EUV in-band signal enhancement. A 6 ns Nd:YAG laser operating at 1064 nm and 266 nm was used for generating the prepulse plume. The expanding plume was then reheated by a 35 ns CO2 laser operating at 10.6 μm. The role of prepulse wavelength and energy on EUV conversion efficiency is discussed.

  12. Numerical simulations based on probe measurements in EUV-induced hydrogen plasma

    Science.gov (United States)

    Abrikosov, Alex; Reshetnyak, Viktor; Astakhov, Dmitry; Dolgov, Alexandr; Yakushev, Oleg; Lopaev, Dmitry; Krivtsun, Vladimir

    2017-04-01

    We use the two-dimensional particle-in-cell model with Monte Carlo collisions to study the plasma induced in hydrogen by short pulses of extreme ultraviolet (EUV) radiation at wavelengths in the range 10-20 nm with a pulse duration of about 40 ns (FWHM). This plasma is formed via both photoionization by the high-energy EUV photons and by the secondary photoelectrons emitted from the hydrogen molecules and the irradiated surface. The latter process can be enhanced by the external electric field that accelerates the electrons. In order to establish a base for our model so as to obtain accurate results, we record a temporally-resolved series of current-voltage characteristics for a small probing electrode inserted into EUV-induced hydrogen plasma. We then resort to simulating this plasma in the same geometry with the probe in our model which we validate by matching its results to the experimentally measured dynamics of the probe current-voltage curves. Having validated the model this way, we use this model as an independent instrument capable of obtaining the spatiotemporal picture of EUV-induced plasma evolution. We use this instrument to study the plasma formation during the EUV pulse and point out the processes that take part in forming this plasma, such as impact ionization and direct ionization by EUV photons.

  13. Comparison of accuracies of an intraoral spectrophotometer and conventional visual method for shade matching using two shade guide systems.

    Science.gov (United States)

    Parameswaran, Vidhya; Anilkumar, S; Lylajam, S; Rajesh, C; Narayan, Vivek

    2016-01-01

    This in vitro study compared the shade matching abilities of an intraoral spectrophotometer and the conventional visual method using two shade guides. The results of previous investigations between color perceived by human observers and color assessed by instruments have been inconclusive. The objectives were to determine accuracies and interrater agreement of both methods and effectiveness of two shade guides with either method. In the visual method, 10 examiners with normal color vision matched target control shade tabs taken from the two shade guides (VITAPAN Classical™ and VITAPAN 3D Master™) with other full sets of the respective shade guides. Each tab was matched 3 times to determine repeatability of visual examiners. The spectrophotometric shade matching was performed by two independent examiners using an intraoral spectrophotometer (VITA Easyshade™) with five repetitions for each tab. Results revealed that visual method had greater accuracy than the spectrophotometer. The spectrophotometer; however, exhibited significantly better interrater agreement as compared to the visual method. While VITAPAN Classical shade guide was more accurate with the spectrophotometer, VITAPAN 3D Master shade guide proved better with visual method. This in vitro study clearly delineates the advantages and limitations of both methods. There were significant differences between the methods with the visual method producing more accurate results than the spectrophotometric method. The spectrophotometer showed far better interrater agreement scores irrespective of the shade guide used. Even though visual shade matching is subjective, it is not inferior and should not be underrated. Judicious combination of both techniques is imperative to attain a successful and esthetic outcome.

  14. Satisfaction of Dental Students, Faculty, and Patients with Tooth Shade-Matching Using a Spectrophotometer.

    Science.gov (United States)

    Ballard, Erin; Metz, Michael J; Harris, Bryan T; Metz, Cynthia J; Chou, Jang-Ching; Morton, Dean; Lin, Wei-Shao

    2017-05-01

    The aims of this study were to evaluate dental students' clinical shade-matching outcomes (from subjective use of shade guide) with an objective electronic shade-matching tool (spectrophotometer); to assess patients', students', and supervising faculty members' satisfaction with the clinical shade-matching outcomes; and to assess clinicians' support for use of the spectrophotometer to improve esthetic outcomes. A total of 103 volunteer groups, each consisting of patient, dental student, and supervising faculty member at the University of Louisville, were recruited to participate in the study in 2015. Using the spectrophotometer, clinical shade-matching outcome (ΔEclinical) and laboratory shade-matching outcome (ΔElaboratory) were calculated. Two five-point survey items were used to assess the groups' satisfaction with the clinical shade-matching outcome and support for an objective electronic shade-matching tool in the student clinic. The results showed that both ΔEclinical (6.5±2.4) and ΔElaboratory (4.3±2.0) were outside the clinical acceptability threshold ΔE values of 2.7, when visual shade-matching method (subjective usage of shade guide) was used to fabricate definitive restorations. Characteristics of the patients, dental students, supervising faculty members, and restorations had minimal to no effect on the ΔEclinical The patients, dental students, and supervising faculty members generally had positive opinions about the clinical shade-matching outcome, despite the increased ΔEclinical observed. Overall, clinical shade-matching outcomes in this school need further improvement, but the patients' positive opinions may indicate the need to revisit the acceptability threshold ΔE value of 2.7 in the academic setting.

  15. Flight of a UV spectrophotometer aboard Galileo 2, the NASA Convair 990 aircraft

    Science.gov (United States)

    Sellers, B.; Hunderwadel, J. L.; Hanser, F. A.

    1976-01-01

    An ultraviolet interference-filter spectrophotometer (UVS) fabricated for aircraft-borne use on the DOT Climatic Impact Assessment Program (CIAP) has been successfully tested in a series of flights on the NASA Convair 990, Galileo II. UV flux data and the calculated total ozone above the flight path are reported for several of the flights. Good agreement is obtained with the total ozone as deducted by integration of an ozone sonde vertical profile obtained at Wallops Island, Virginia near the time of a CV-990 underpass. Possible advantages of use of the UVS in the NASA Global Atmospheric Sampling Program are discussed.

  16. Determining the Absorbance Spectra of Photochromic Materials From Measured Spectrophotometer Data

    Science.gov (United States)

    Downie, John D.

    1998-01-01

    If a two-state photochromic material is optically bleached, the absorbance spectrum data measured by a spectrophotometer is in general comprised of components from both the ground state and the upper state. Under general conditions, it may be difficult to extract the actual upper state spectrum from the spectrum of the bleached material. A simple algorithm is presented here for the recovery of the pure absorbance spectra of the upper state of a material such as bacteriorhodopsin, given single wavelength bleaching illumination, steady-state conditions, and accurate knowledge of phototransition rates and thermal decay rates.

  17. Image plane detector spectrophotometer - Application to O2 atmospheric band nightglow

    Science.gov (United States)

    Luo, Mingzhao; Yee, Jeng-Hwa; Hays, Paul B.

    1988-01-01

    A new variety of low resolution spectrometer is described. This device, an image plane detector spectrophotometer, has high sensitivity and modest resolution sufficient to determine the rotational temperature and brightness of molecular band emissions. It uses an interference filter as a dispersive element and a multichannel image plane detector as the photon collecting device. The data analysis technqiue used to recover the temperature of the emitter and the emission brightness is presented. The atmospheric band of molecular oxygen is used to illustrate the use of the device.

  18. ESP Teaching for Tourism. An Experimental Study

    Directory of Open Access Journals (Sweden)

    Buzarna-Tihenea (Gălbează Alina

    2017-01-01

    Full Text Available This paper is focused on those teaching and learning methods and techniques which can improve the practical use of English for work-related purposes, this giving the students the opportunity to develop their language skills by means of attractive, motivating and useful learning activities. The paper aims at providing an in-depth knowledge about ways of studying and applying English for Specific Purposes in the Tourism field, as well as types of activities to be used in the classroom in order to assist learners overcome language difficulties. It is of great importance to emphasize the specific tasks and strategies used while teaching ESP for Tourism classes, strategies that differ from the ones used in a traditional English language classroom. The main purpose of all these ESP methods and approaches is to prepare students for their future jobs so that they can perform effectively in their area of work.

  19. The ESP future is 300 C

    Energy Technology Data Exchange (ETDEWEB)

    Burleigh, L. [Baker Hughes, Tulsa, OK (United States)

    2008-07-01

    Baker Hughes Centrilift has developed an extreme temperature electrical submersible pump (ESP) system for steam assisted gravity drainage (SAGD) for oil sand applications. The system overcomes the challenges associated with extreme temperature, temperature cycling, free gas or steam production and abrasives. The 250 C production system was designed for 250 C fluid temperatures, while the target operating temperature of the 300 C hot loop system is 300 degrees C. This presentation outlined the primary design features of the ESP system which include an induction motor, step down transformer, step up transformer, plug-in pothead, wellhead penetrator, seal section, gas separator, multi-stage centrifugal pump, sensors and data optimization services. The system also includes corrosion resistant CEL flat cables that have a temperature rating of 40 to 232 degrees C. Research and development activities have included component testing. Slurry loop tests have contributed to a better understanding of abrasive and erosive wear. The run time performance at the newly constructed Leduc Centrilift SAGD assembly facility in Alberta was also highlighted. The advantages of the ESP system include immediate installation after well completion, installation during heat up phase and immediate start-up without any intervention. In addition, gas lift infrastructure is not needed as the pad layout is more efficient without gas lift. figs.

  20. Novel EUV mask black border and its impact on wafer imaging

    Science.gov (United States)

    Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Watanabe, Genta; Ito, Shin; Yoshida, Itaru; Maruyama, Shingo; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

    2016-03-01

    EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The EUV mask is a key element in the lithographic scanner optical path. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the EUV light reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. To reduce this effect an etched multilayer type black border was developed, and it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light which is emitted from EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel black border called Hybrid Black Border has been developed which allows to eliminate EUV and DUV OOB light reflection. Direct measurements of OOB light from HBB and Normal BB are performed on NXE:3300B ASML EUV scanner; it is shown that HBB OOB reflection is 3x lower than that of Normal BB. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

  1. Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas

    Science.gov (United States)

    Makimura, Tetsuya; Torii, Shuichi; Nakamura, Daisuke; Takahashi, Akihiko; Okada, Tatsuo; Niino, Hiroyuki; Murakami, Kouichi

    2013-05-01

    We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10{300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer an be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.

  2. Native pattern defect inspection of EUV mask using advanced electron beam inspection system

    Science.gov (United States)

    Shimomura, Takeya; Inazuki, Yuichi; Abe, Tsukasa; Takikawa, Tadahiko; Mohri, Hiroshi; Hayashi, Naoya; Wang, Fei; Ma, Long; Zhao, Yan; Kuan, Chiyan; Xiao, Hong; Jau, Jack

    2010-09-01

    Fabrication of defect free EUV mask is one of the most critical roadblocks for implementing EUV lithography into semiconductor high volume manufacturing for 22nm half-pitch (HP) node and beyond. At the same time, development of quality assurance process for the defect free EUV mask is also another critical challenge we need to address before the mass production. Inspection tools act important role in quality assurance process to ensure the defect free EUV mask. We are currently evaluating two types of inspection system: optical inspection (OPI) system and electron beam inspection (EBI) system [1, 2]. While OPI system is sophisticated technology and has an advantage in throughput, EBI system is superior in sensitivity and extendability to even small pattern. We evaluated sensitivity of EBI system and found it could detect 25 nm defects on 88nm L/S pattern which is as small as target defect size for 23 nm Flash HP pattern in 2013 in 2009 ITRS lithography roadmap [2, 3]. EBI system is effective inspection tool even at this moment to detect such small defects on 88nm HP pattern, though there are still some challenges such as the slow throughput and the reliability. Therefore, EBI system can be used as bridge tool to compensate insufficient sensitivity of current inspection tools and improve EUV mask fabrication process to achieve the defect free EUV mask. In this paper, we will present the results of native pattern defects founded on large field 88nm HP pattern using advance EBI system. We will also classify those defects and propose some ideas to mitigate them and realize the defect free EUV mask, demonstrating the capability of EBI as bridge tool.

  3. Solar Spectral Proxy Irradiance from GOES (SSPRING): a model for solar EUV irradiance

    Science.gov (United States)

    Suess, Katherine; Snow, Martin; Viereck, Rodney; Machol, Janet

    2016-02-01

    Several currently operating instruments are able to measure the full EUV spectrum at sufficient wavelength resolution for use in upper-atmosphere modeling, the effects of space weather, and modeling satellite drag. However, no missions are planned at present to succeed the Thermosphere Ionosphere Mesosphere Energetics and Dynamics (TIMED) and Solar Dynamics Observatory (SDO) missions, which currently provide these data sources. To develop a suitable replacement for these measurements, we use two broadband EUV channels on the NOAA GOES satellites, the magnesium core-to-wing ratio (Mg II index) from the SOlar Radiation and Climate Experiment (SORCE) as well as EUV and Mg II time averages to model the EUV spectrum from 0.1 to 105 nm at 5-nm spectral resolution and daily time resolution. A Levenberg-Marquardt least squares fitting algorithm is used to determine a coefficient matrix that best reproduces a reference data set when multiplied by input data. The coefficient matrix is then applied to model data outside of the fitting interval. Three different fitting intervals are tested, with a variable fitting interval utilizing all days of data before the prediction date producing the best results. The correlation between the model results and the observed spectrum is found to be above 95% for the 0.1-50 nm range, and between 74% and 95% for the 50-105 nm range. We also find a favorable comparison between our results and the Flare Irradiance Spectral Model (FISM). These results provide a promising potential source for an empirical EUV spectral model after direct EUV measurements are no longer available, and utilize a similar EUV modeling technique as the upcoming GOES-R satellites.

  4. Solar Spectral Proxy Irradiance from GOES (SSPRING: a model for solar EUV irradiance

    Directory of Open Access Journals (Sweden)

    Suess Katherine

    2016-01-01

    Full Text Available Several currently operating instruments are able to measure the full EUV spectrum at sufficient wavelength resolution for use in upper-atmosphere modeling, the effects of space weather, and modeling satellite drag. However, no missions are planned at present to succeed the Thermosphere Ionosphere Mesosphere Energetics and Dynamics (TIMED and Solar Dynamics Observatory (SDO missions, which currently provide these data sources. To develop a suitable replacement for these measurements, we use two broadband EUV channels on the NOAA GOES satellites, the magnesium core-to-wing ratio (Mg II index from the SOlar Radiation and Climate Experiment (SORCE as well as EUV and Mg II time averages to model the EUV spectrum from 0.1 to 105 nm at 5-nm spectral resolution and daily time resolution. A Levenberg-Marquardt least squares fitting algorithm is used to determine a coefficient matrix that best reproduces a reference data set when multiplied by input data. The coefficient matrix is then applied to model data outside of the fitting interval. Three different fitting intervals are tested, with a variable fitting interval utilizing all days of data before the prediction date producing the best results. The correlation between the model results and the observed spectrum is found to be above 95% for the 0.1–50 nm range, and between 74% and 95% for the 50–105 nm range. We also find a favorable comparison between our results and the Flare Irradiance Spectral Model (FISM. These results provide a promising potential source for an empirical EUV spectral model after direct EUV measurements are no longer available, and utilize a similar EUV modeling technique as the upcoming GOES-R satellites.

  5. BREAKOUT RECONNECTION OBSERVED BY THE TESIS EUV TELESCOPE

    Energy Technology Data Exchange (ETDEWEB)

    Reva, A. A.; Ulyanov, A. S.; Shestov, S. V.; Kuzin, S. V., E-mail: reva.antoine@gmail.com [Lebedev Physical Institute, Russian Academy of Sciences (Russian Federation)

    2016-01-10

    We present experimental evidence of the coronal mass ejection (CME) breakout reconnection, observed by the TESIS EUV telescope. The telescope could observe solar corona up to 2 R{sub ⊙} from the Sun center in the Fe 171 Å line. Starting from 2009 April 8, TESIS observed an active region (AR) that had a quadrupolar structure with an X-point 0.5 R{sub ⊙} above photosphere. A magnetic field reconstructed from the Michelson Doppler Imager data also has a multipolar structure with an X-point above the AR. At 21:45 UT on April 9, the loops near the X-point started to move away from each other with a velocity of ≈7 km s{sup −1}. At 01:15 UT on April 10, a bright stripe appeared between the loops, and the flux in the GOES 0.5–4 Å channel increased. We interpret the loops’ sideways motion and the bright stripe as evidence of the breakout reconnection. At 01:45 UT, the loops below the X-point started to slowly move up. At 15:10 UT, the CME started to accelerate impulsively, while at the same time a flare arcade formed below the CME. After 15:50 UT, the CME moved with constant velocity. The CME evolution precisely followed the breakout model scenario.

  6. Breakout Reconnection Observed by the TESIS EUV Telescope

    Science.gov (United States)

    Reva, A. A.; Ulyanov, A. S.; Shestov, S. V.; Kuzin, S. V.

    2016-01-01

    We present experimental evidence of the coronal mass ejection (CME) breakout reconnection, observed by the TESIS EUV telescope. The telescope could observe solar corona up to 2 R⊙ from the Sun center in the Fe 171 Å line. Starting from 2009 April 8, TESIS observed an active region (AR) that had a quadrupolar structure with an X-point 0.5 R⊙ above photosphere. A magnetic field reconstructed from the Michelson Doppler Imager data also has a multipolar structure with an X-point above the AR. At 21:45 UT on April 9, the loops near the X-point started to move away from each other with a velocity of ≈7 km s-1. At 01:15 UT on April 10, a bright stripe appeared between the loops, and the flux in the GOES 0.5-4 Å channel increased. We interpret the loops’ sideways motion and the bright stripe as evidence of the breakout reconnection. At 01:45 UT, the loops below the X-point started to slowly move up. At 15:10 UT, the CME started to accelerate impulsively, while at the same time a flare arcade formed below the CME. After 15:50 UT, the CME moved with constant velocity. The CME evolution precisely followed the breakout model scenario.

  7. Mercury’s EUV Reflectance Spectrum From Mariner 10 Revisited

    Science.gov (United States)

    Vilas, Faith; Hendrix, Amanda R.; Jensen, Elizabeth A.

    2015-11-01

    Carbon, as graphite, has emerged from recent analyses of MESSENGER spectrophotometry and theoretical modeling as a possible source for the darkening component in the Low Reflectance Material (LRM), pervasive across Mercury’s surface. Murchie et al. (Icarus 254, 287, 2015) propose graphite, in amounts consistent with results from MESSENGER’s elemental experiments for the presence of C, as the most likely darkening component in LRM. Vander Kaaden and McCubbin (JGR Planets 120, 195, 2015) report that graphite would be the only buoyant phase in an early magma ocean, and any primary flotation crust would have retained C in the form of graphite. Alternatively, Gillis-Davis et al. (Abstract P1 1A-07, AGU, 2013) suggest that nanophase and microphase iron, produced by impacts into Mercury’s crust before and during the late heavy bombardment, could darken the LRM. Carbon in the forms of graphite and anthracite has distinctive far-UV spectral reflectance features. The MESSENGER MASCS UVVS spectrometer does not extend to wavelengths short enough to observe these features. The Mariner 10 EUV airglow spectrometer observed broad swaths of Mercury in 10 filters at wavelengths ranging from 304Å to 1657Å, each having 20Å passbands. We now re-analyze these data in a search for this distinctive UV signature of graphite across large areas of Mercury’s surface, and will report on the results.

  8. EUV nanosecond laser ablation of silicon carbide, tungsten and molybdenum

    Science.gov (United States)

    Frolov, Oleksandr; Kolacek, Karel; Schmidt, Jiri; Straus, Jaroslav; Choukourov, Andrei; Kasuya, Koichi

    2015-09-01

    In this paper we present results of study interaction of nanosecond EUV laser pulses at wavelength of 46.9 nm with silicon carbide (SiC), tungsten (W) and molybdenum (Mo). As a source of laser radiation was used discharge-plasma driver CAPEX (CAPillary EXperiment) based on high current capillary discharge in argon. The laser beam is focused with a spherical Si/Sc multilayer-coated mirror on samples. Experimental study has been performed with 1, 5, 10, 20 and 50 laser pulses ablation of SiC, W and Mo at various fluence values. Firstly, sample surface modification in the nanosecond time scale have been registered by optical microscope. And the secondly, laser beam footprints on the samples have been analyzed by atomic-force microscope (AFM). This work supported by the Czech Science Foundation under Contract GA14-29772S and by the Grant Agency of the Ministry of Education, Youth and Sports of the Czech Republic under Contract LG13029.

  9. White light photothermal lens spectrophotometer for the determination of absorption in scattering samples.

    Science.gov (United States)

    Marcano, Aristides; Alvarado, Salvador; Meng, Junwei; Caballero, Daniel; Moares, Ernesto Marín; Edziah, Raymond

    2014-01-01

    We developed a pump-probe photothermal lens spectrophotometer that uses a broadband arc-lamp and a set of interference filters to provide tunable, nearly monochromatic radiation between 370 and 730 nm as the pump light source. This light is focused onto an absorbing sample, generating a photothermal lens of millimeter dimensions. A highly collimated monochromatic probe light from a low-power He-Ne laser interrogates the generated lens, yielding a photothermal signal proportional to the absorption of light. We measure the absorption spectra of scattering dye solutions using the device. We show that the spectra are not affected by the presence of scattering, confirming that the method only measures the absorption of light that results in generation of heat. By comparing the photothermal spectra with the usual absorption spectra determined using commercial transmission spectrophotometers, we estimate the quantum yield of scattering of the sample. We discuss applications of the device for spectroscopic characterization of samples such as blood and gold nanoparticles that exhibit a complex behavior upon interaction with light.

  10. [Design of flat field holographic concave grating for near-infrared spectrophotometer].

    Science.gov (United States)

    Xiang, Xian-Yi; Wen, Zhi-Yu

    2008-07-01

    Near-infrared spectrum analysis can be used to determine the nature or test quantitatively some chemical compositions by detecting molecular double frequency and multiple frequency absorption. It has been used in agriculture, biology, petrifaction, foodstuff, medicament, spinning and other fields. Near-infrared spectrophotometer is the main apparatus for near-infrared spectrum analysis, and the grating is the most important part of the apparatus. Based on holographic concave grating theory and optic design software CODE V, a flat field holographic concave grating for near-infrared spectrophotometer was designed from primary structure, which relied on global optimization of the software. The contradiction between wide spectrum bound and limited spectrum extension was resolved, aberrations were reduced successfully, spectrum information was utilized fully, and the optic structure of spectrometer was highly efficient. Using CODE V software, complex high-order aberration equations need not be solved, the result can be evaluated quickly, flat field and resolving power can be kept in balance, and the work efficiency is also enhanced. A paradigm of flat field holographic concave grating is given, it works between 900 nm to 1 700 nm, the diameter of the concave grating is 25 mm, and F/ # is 1. 5. The design result was analyzed and evaluated. It was showed that if the slit source, whose width is 50 microm, is used to reconstruction, the theoretic resolution capacity is better than 6.3 nm.

  11. Evaluation of Biocompatibility of Root Canal Sealers on L929 Fibroblasts with Multiscan EX Spectrophotometer.

    Science.gov (United States)

    Konjhodzic-Prcic, Alma; Jakupovic, Selma; Hasic-Brankovic, Lajla; Vukovic, Amra

    2015-06-01

    The purpose of the current study was to estimate the biocompatibility of endodontic sealers with different bases on L929 mouse fibroblasts permanent cell line using Multiscan EX Spectrophotometer. Endodontics sealers used in this study were GuttaFlow (Roeko) silicone based sealer, AH plus (De Tray-DENTSPLY) epoxy resin based, Apexit (Vivadent) calcium hydroxide based and Endorez (Ultradent) methacrylate based sealer. Sealer were tested trough time, freshly mixed 24 h, 48h and 7 days after setting. Biocompatibility was determinate on permanent cell lines L929 mouse fibroblasts trough cytotoxicity using MTT assay. Level of absorption was measured with multi scan EX spectrophotometer on length 420-600 nm. Sealer based on calcium hydroxide Apexit Plus, GuttaFlow silicone based sealer and AH plus epoxy resin based sealer, have shown a low cytotoxicity through the all periods of time on culture of L292 mouse fibroblasts. Methacrylate based sealer, Endorez showed moderate cytotoxicity when freshly mixed and after 7 days. After 24 hours the visibility of the cells was 74,0% and after 48 hours 65,1%. which is slightly cytotoxic. According to results of this study there is a statistically significant difference among the groups p<0,05 for all the tested sealers. Apexit Plus, GuttaFlow and AH plus can be considered as biocompatibile. EndoREZ sealer which is based on methacrylate, after 7 days shows 50,1% of visible live cells which is considered as moderate cytotoxicity.

  12. Non-invasive prediction of hematocrit levels by portable visible and near-infrared spectrophotometer.

    Science.gov (United States)

    Sakudo, Akikazu; Kato, Yukiko Hakariya; Kuratsune, Hirohiko; Ikuta, Kazuyoshi

    2009-10-01

    After blood donation, in some individuals having polycythemia, dehydration causes anemia. Although the hematocrit (Ht) level is closely related to anemia, the current method of measuring Ht is performed after blood drawing. Furthermore, the monitoring of Ht levels contributes to a healthy life. Therefore, a non-invasive test for Ht is warranted for the safe donation of blood and good quality of life. A non-invasive procedure for the prediction of hematocrit levels was developed on the basis of a chemometric analysis of visible and near-infrared (Vis-NIR) spectra of the thumbs using portable spectrophotometer. Transmittance spectra in the 600- to 1100-nm region from thumbs of Japanese volunteers were subjected to a partial least squares regression (PLSR) analysis and leave-out cross-validation to develop chemometric models for predicting Ht levels. Ht levels of masked samples predicted by this model from Vis-NIR spectra provided a coefficient of determination in prediction of 0.6349 with a standard error of prediction of 3.704% and a detection limit in prediction of 17.14%, indicating that the model is applicable for normal and abnormal value in Ht level. These results suggest portable Vis-NIR spectrophotometer to have potential for the non-invasive measurement of Ht levels with a combination of PLSR analysis.

  13. Instrumentation-related uncertainty of reflectance and transmittance measurements with a two-channel spectrophotometer.

    Science.gov (United States)

    Peest, Christian; Schinke, Carsten; Brendel, Rolf; Schmidt, Jan; Bothe, Karsten

    2017-01-01

    Spectrophotometers are operated in numerous fields of science and industry for a variety of applications. In order to provide confidence for the measured data, analyzing the associated uncertainty is valuable. However, the uncertainty of the measurement results is often unknown or reduced to sample-related contributions. In this paper, we describe our approach for the systematic determination of the measurement uncertainty of the commercially available two-channel spectrophotometer Agilent Cary 5000 in accordance with the Guide to the expression of uncertainty in measurements. We focus on the instrumentation-related uncertainty contributions rather than the specific application and thus outline a general procedure which can be adapted for other instruments. Moreover, we discover a systematic signal deviation due to the inertia of the measurement amplifier and develop and apply a correction procedure. Thereby we increase the usable dynamic range of the instrument by more than one order of magnitude. We present methods for the quantification of the uncertainty contributions and combine them into an uncertainty budget for the device.

  14. Vertical-type chiroptical spectrophotometer (I): instrumentation and application to diffuse reflectance circular dichroism measurement.

    Science.gov (United States)

    Harada, Takunori; Hayakawa, Hiroshi; Kuroda, Reiko

    2008-07-01

    We have designed and built a novel universal chiroptical spectrophotometer (UCS-2: J-800KCMF), which can carry out in situ chirality measurement of solid samples without any pretreatment, in the UV-vis region and with high relative efficiency. The instrument was designed to carry out transmittance and diffuse reflectance (DR) circular dichroism (CD) measurements simultaneously, thus housing two photomultipliers. It has a unique feature that light impinges on samples vertically so that loose powders can be measured by placing them on a flat sample holder in an integrating sphere. As is our first universal chiroptical spectrophotometer, UCS-1, two lock-in amplifiers are installed to remove artifact signals arising from macroscopic anisotropies which are unique to solid samples. High performance was achieved by theoretically analyzing and experimentally proven the effect of the photoelastic modulator position on the CD base line shifts, and by selecting high-quality optical and electric components. Measurement of microcrystallines of both enantiomers of ammonium camphorsulfonate by the DRCD mode gave reasonable results.

  15. Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing

    Science.gov (United States)

    Cobb, Jonathan; Jang, Sunghoon; Ser, Junghoon; Kim, Insung; Yeap, Johnny; Lucas, Kevin; Do, Munhoe; Kim, Young-Chang

    2011-04-01

    Although technical issues remain to be resolved, EUV lithography is now a serious contender for critical layer patterning of upcoming 2X node memory and 14nm Logic technologies in manufacturing. If improvements continue in defectivity, throughput and resolution, then EUV lithography appears that it will be the most extendable and the cost-effective manufacturing lithography solution for sub-78nm pitch complex patterns. EUV lithography will be able to provide a significant relaxation in lithographic K1 factor (and a corresponding simplification of process complexity) vs. existing 193nm lithography. The increased K1 factor will result in some complexity reduction for mask synthesis flow elements (including illumination source shape optimization, design pre-processing, RET, OPC and OPC verification). However, EUV does add well known additional complexities and issues to mask synthesis flows such as across-lens shadowing variation, across reticle flare variation, new proximity effects to be modeled, significant increase in pre-OPC and fracture file size, etc. In this paper, we investigate the expected EUV-specific issues and new requirements for a production tapeout mask synthesis flow. The production EUV issues and new requirements are in the categories of additional physical effects to be corrected for; additional automation or flow steps needed; and increase in file size at different parts in the flow. For example, OASIS file sizes after OPC of 250GigaBytes (GB) and files sizes after mask data prep of greater than three TeraBytes (TB) are expected to be common. These huge file sizes will place significant stress on post-processing methods, OPC verification, mask data fracture, file read-in/read-out, data transfer between sites (e.g., to the maskshop), etc. With current methods and procedures, it is clear that the hours/days needed to complete EUV mask synthesis mask data flows would significantly increase if steps are not taken to make efficiency improvements

  16. On a Small-scale EUV Wave: The Driving Mechanism and the Associated Oscillating Filament

    Science.gov (United States)

    Shen, Yuandeng; Liu, Yu; Tian, Zhanjun; Qu, Zhining

    2017-12-01

    We present observations of a small-scale extreme-ultraviolet (EUV) wave that was associated with a mini-filament eruption and a GOES B1.9 micro-flare in the quiet-Sun region. The initiation of the event was due to the photospheric magnetic emergence and cancellation in the eruption source region, which first caused the ejection of a small plasma ejecta, then the ejecta impacted a nearby mini-filament and thereby led to the filament’s eruption and the associated flare. During the filament eruption, an EUV wave at a speed of 182{--}317 {km} {{{s}}}-1 was formed ahead of an expanding coronal loop, which propagated faster than the expanding loop and showed obvious deceleration and reflection during the propagation. In addition, the EUV wave further resulted in the transverse oscillation of a remote filament whose period and damping time are 15 and 60 minutes, respectively. Based on the observational results, we propose that the small-scale EUV wave should be a fast-mode magnetosonic wave that was driven by the expanding coronal loop. Moreover, with the application of filament seismology, it is estimated that the radial magnetic field strength is about 7 Gauss. The observations also suggest that small-scale EUV waves associated with miniature solar eruptions share similar driving mechanisms and observational characteristics with their large-scale counterparts.

  17. Reconstruction of the solar EUV irradiance from 1996 to 2010 based on SOHO/EIT images

    Directory of Open Access Journals (Sweden)

    Haberreiter Margit

    2014-01-01

    Full Text Available The solar Extreme UltraViolet (EUV spectrum has important effects on the Earth’s upper atmosphere. For a detailed investigation of these effects it is important to have a consistent data series of the EUV spectral irradiance available. We present a reconstruction of the solar EUV irradiance based on SOHO/EIT images, along with synthetic spectra calculated using different coronal features which represent the brightness variation of the solar atmosphere. The EIT images are segmented with the SPoCA2 tool which separates the features based on a fixed brightness classification scheme. With the SOLMOD code we then calculate intensity spectra for the 10–100 nm wavelength range and each of the coronal features. Weighting the intensity spectra with the area covered by each of the features yields the temporal variation of the EUV spectrum. The reconstructed spectrum is then validated against the spectral irradiance as observed with SOHO/SEM. Our approach leads to good agreement between the reconstructed and the observed spectral irradiance. This study is an important step toward understanding variations in the solar EUV spectrum and ultimately its effect on the Earth’s upper atmosphere.

  18. Laser-plasma EUV source dedicated for surface processing of polymers

    Science.gov (United States)

    Bartnik, A.; Fiedorowicz, H.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Wachulak, P. W.

    2011-08-01

    In this work, a 10 Hz laser-plasma extreme ultraviolet (EUV) source built for surface processing of polymers is presented. The source is based on a double-stream gas puff target created in a vacuum chamber synchronously with the pumping laser pulse. The target is formed by pulsed injection of Kr, Xe or a KrXe gas mixture into a hollow stream of helium. The EUV radiation is focused using a grazing incidence gold-plated ellipsoidal collector. Spectrum of the reflected radiation consists of a narrow feature with intensity maximum at 10-11 nm wavelength and a long-wavelength spectral tail up to 70 nm. The exact spectral distribution depends on a gas applied for plasma creation. To avoid strong absorption of the EUV radiation in a residual gas present in the chamber during the source operation a two step differential pumping system was employed. The system allows for polymer processing under relatively high vacuum conditions (10 -5 mbar) or in a reactive gas atmosphere. Polymer samples can be irradiated in a focal plane of the EUV collector or at some distance downstream the focal plane. This way fluence of the EUV beam at the polymer surface can be regulated.

  19. Cross sections of EUV PAGs: influence of concentration, electron energy, and structure

    Science.gov (United States)

    Grzeskowiak, Steven; Narasimhan, Amrit; Wisehart, Liam; Schad, Jonathon; Neisser, Mark; Ocola, Leonidas E.; Brainard, Robert L.; Denbeaux, Greg

    2016-03-01

    Optimizing the photochemistry of extreme ultraviolet (EUV) photoresists should provide faster, more efficient resists which would lead to greater throughput in manufacturing. The fundamental reaction mechanisms in EUV resists are believed to be due to interactions with energetic electrons liberated by ionization. Identifying the likelihood (or cross section) of how these photoelectrons interact with resist components is critical to optimizing the performance of EUV resists. Chemically amplified resists utilize photoacid generators (PAGs) to improve sensitivity; measuring the cross section of electron induced decomposition of different PAGs will provide insight into developing new resist materials. To study the interactions of photoelectrons generated by EUV absorption, photoresists were exposed to electron beams at energies between 80 and 250 eV. The reactions between PAG molecules and electrons were measured using a mass spectrometer to monitor the levels of small molecules produced by PAG decomposition that outgassed from the film. Comparing the cross sections of a variety of PAG molecules can provide insight into the relationship between chemical structure and reactivity to the electrons in their environments. This research is a part of a larger SEMATECH research program to understand the fundamentals of resist exposures to help in the development of new, better performing EUV resists.

  20. Comparison of EUV spectral and ion emission features from laser-produced Sn and Li plasmas

    Science.gov (United States)

    Coons, R. W.; Campos, D.; Crank, M.; Harilal, S. S.; Hassanein, A.

    2010-04-01

    Planar slabs of pure Sn and Li were irradiated with 1064 nm, 9 ns Nd:YAG laser pulses. The resulting plasmas were evaluated with an absolutely calibrated extreme ultraviolet (EUV) power tool, a transmission grating spectrograph, a pinhole camera, and a Faraday cup. These diagnostic tools have allowed us to determine EUV conversion efficiency (CE), EUV spectral emission features, EUV-emitting plasma size, and the kinetic energies and fluxes of ions at various laser intensities for both Sn and Li plasmas. The maximum estimated CE values for Li and Sn plasmas are 1 +/- 0.1 % and 2 +/- 0.2 %, respectively. The Li2+ Lyman-α line and Sn8-13+ lines generate the in-band emissions of Li and Sn. The intensity of Li2+ lines was found to increase with laser intensity. However, the Sn unresolved transmission array (UTA) showed remarkable changes with at higher laser intensities, including the appearance of a spectral dip. EUV plasma images showed that Sn plasmas take on a conical shape, as opposed to the hemispherical shape of Li plasmas. Ion debris analysis showed the kinetic energies for Li ions are less than that of Sn ions under similar conditions. Moreover, the kinetic spread of Li ions has been found to be narrower compared to the kinetic energy distribution of the Sn ions. We also compared the ion flux emitted by Sn and Li plasmas.

  1. Correlation of experimentally measured atomic scale properties of EUV photoresist to modeling performance: an exploration

    Science.gov (United States)

    Kandel, Yudhishthir; Chandonait, Jonathan; Melvin, Lawrence S.; Marokkey, Sajan; Yan, Qiliang; Grzeskowiak, Steven; Painter, Benjamin; Denbeaux, Gregory

    2017-03-01

    Extreme ultraviolet (EUV) lithography at 13.5 nm stands at the crossroads of next generation patterning technology for high volume manufacturing of integrated circuits. Photo resist models that form the part of overall pattern transform model for lithography play a vital role in supporting this effort. The physics and chemistry of these resists must be understood to enable the construction of accurate models for EUV Optical Proximity Correction (OPC). In this study, we explore the possibility of improving EUV photo-resist models by directly correlating the parameters obtained from experimentally measured atomic scale physical properties; namely, the effect of interaction of EUV photons with photo acid generators in standard chemically amplified EUV photoresist, and associated electron energy loss events. Atomic scale physical properties will be inferred from the measurements carried out in Electron Resist Interaction Chamber (ERIC). This study will use measured physical parameters to establish a relationship with lithographically important properties, such as line edge roughness and CD variation. The data gathered from these measurements is used to construct OPC models of the resist.

  2. Repeatability in Color Measurements of a Spectrophotometer using Different Positioning Devices.

    Science.gov (United States)

    Hemming, Michael; Kwon, So Ran; Qian, Fang

    2015-12-01

    This study aimed to evaluate the repeatability of color measurements of an intraoral spectrophotometer with the use of three different methods by two operators. A total of 60 teeth were obtained, comprising 30 human maxillary teeth [central incisors (n = 10); canines (n = 10); molars (n = 10)] and 30 artificial teeth [lateral incisors (n = 10); premolar (n = 20)]. Multiple repeated color measurements were obtained from each tooth using three measuring methods by each of the two operators. Five typodonts with alternating artificial and human teeth were made. Measurements were taken by two operators with the Vita EasyShade spectrophotometer using the custom tray (CT), custom jig (CJ) and free hand (FH) method, twice, at an interval of 2 to 7 days. Friedman test was used to detect difference among the three color measuring methods. Post hoc Wilcoxon signed-rank test with Bonferroni correction applied was used for pair-wise comparison of color measurements among the three methods. Additionally, a paired-sample t-test was used to assess a significant difference between the two duplicated measurements made on the same tooth by the same operator for each color parameter and measuring method. For operator A, mean (SD) overall color change-ΔE* (SD) perceived for FH, CT and CJ were 2.21(2.00), 2.39 (1.58) and 2.86 (1.92), respectively. There was statistically significant difference in perceived ΔE* in FH vs CJ (p = 0.0107). However, there were no significant differences between FH and CT (p = 0.2829) or between CT and CJ (p = 0.1159). For operator B mean ΔE* (SD) for FH, CT and CJ were 3.24 (3.46), 1.95 (1.19) and 2.45 (1.56), respectively. There was a significant difference between FH and CT (p = 0.0031). However, there were no statistically significant differences in ΔE* in FH vs CJ (p = 0.3696) or CT vs CJ (p = 0.0809). The repeatability of color measurements was different among the three measuring methods by operators. Overall, the CT method worked well for both

  3. [Precision and accuracy of a dental spectrophotometer in gingival color measurement of maxillary anterior gingival].

    Science.gov (United States)

    Du, Yang; Tan, Jian-guo; Chen, Li; Wang, Fang-ping; Tan, Yao; Zhou, Jian-feng

    2012-08-18

    To explore a gingival shade matching method and to evaluate the precision and accuracy of a dental spectrophotometer modified to be used in gingival color measurement. Crystaleye, a dental spectrophotometer (Olympus, Tokyo, Japan) with a custom shading cover was tested. For precision assessment, two experienced experimenters measured anterior maxillary incisors five times for each tooth. A total of 20 healthy gingival sites (attached gingiva, free gingiva and medial gingival papilla in anterior maxillary region) were measured,the Commission Internationale de I' Eclairage (CIE) color parameters (CIE L*a*b*) of which were analyzed using the supporting software. For accuracy assessment, a rectangular area of approximately 3 mm×3 mm was chosen in the attached gingival portion for spectral analysis. PR715 (SpectraScan;Photo Research Inc.,California, USA), a spectroradiometer, was utilized as standard control. Average color differences (ΔE) between the values from PR715 and Crystaleye were calculated. In precision assessment,ΔL* between the values in all the test sites and average values were from(0.28±0.16)to(0.78±0.57), with Δa*and Δb* from(0.28±0.15)to (0.87±0.65),from(0.19±0.09)to( 0.58±0.78), respectively. Average ΔE between values in all test sites and average values were from (0.62 ± 0.17) to (1.25 ± 0.98) CIELAB units, with a total average ΔE(0.90 ± 0.18). In accuracy assessment, ΔL* with control device were from(0.58±0.50)to(2.22±1.89),with Δa*and Δb* from(1.03±0.67)to(2.99±1.32),from(0.68±0.78)to(1.26±0.83), respectively. Average ΔE with the control device were from (2.44±0.82) to (3.51±1.03) CIELAB units, with a total average ΔE (2.96 ± 1.08). With appropriate modification, Crystaleye, the spectrophotometer, has demonstrated relative minor color variations that can be useful in gingival color measurement.

  4. Objectification of facial color inspection to differentiate obstructive/nonobstructive jaundice in neonates by spectrophotometer.

    Science.gov (United States)

    Shen, Zhen; Zheng, Shan; Dong, Rui; Chen, Gong

    2017-12-01

    The purpose of this study was to study whether color difference in facial color truly exists between neonates with obstructive and nonobstructive jaundice, and whether the color difference could be objectified by spectrophotometer. Twelve biliary atresia patients were enrolled in an obstructive jaundice group and 15 neonates admitted for non-conjugated hyperbilirubinemia in a nonobstructive group. Nine patients with syphilis (n=6) and sacrococcygeal teratoma (n=3) were studied as control. Transcutaneous total bilirubin (TB) and hemoglobin were recorded. Face color was measured by spectrophotometer. Spectral reflection curve and L*a*b* model parameters were studied. Facial color of jaundiced neonates were characteristic in waveform that reflectivity at wavelength of 550nm was significantly decreased compared with control by 16.4±3.4%, while not significantly different between obstructive and nonobstructive jaundice (p=0.124). At 650nm, reflection in nonobstructive jaundice was decreased by 8.4±2.3% (pL*a*b* model, mean color difference between obstructive and nonobstructive jaundice was 9.60. L* was significantly different: control (71.84±3.75%)>obstructive jaundice (58.09±1.25%)>nonobstructive jaundice (54.25±7.27%). Value b* was higher in jaundiced patients compared to normal control (11.88±2.16, p<0.001), but not significantly different in obstructive and nonobstructive jaundice (20.12±2.17vs18.25±4.58). Value a* was not significantly different between normal control (5.57±2.38) and obstructive jaundice (5.25±1.19), but was lower than nonobstructive jaundice (14.03±3.29, p<0.001). TB was significantly correlated with b* (R=0.526, p=0.014), while hemoglobin was correlated with a* (R=0.791, p<.001) and L* (R=-0.707, p<.001). Obstructive and nonobstructive jaundice could be objectively differentiated through facial color inspection by spectrophotometer. Study of Diagnostic Test. Level II. Copyright © 2017 Elsevier Inc. All rights reserved.

  5. [Comparison of color reappearance between metal-ceram restoration and foundry-ceram restoration using crystaleye spectrophotometer].

    Science.gov (United States)

    Shi, Tao; Zhang, Ning; Kong, Fan-wen; Zhan, De-song

    2010-10-01

    To study the color reappearance effect of metal-ceram restoration and foundry-ceram restoration using Crystaleye spectrophotometer. 58 metal-ceram restorations and 58 foundry-ceram restorations according to the result of the Crystaleye spectrophotometer were made respectively. The deltaE between restorations and natural teeth as referenced were analyzed. And satisfaction of dentists and patients were evaluated. The deltaE between metal-ceram restorations and natural teeth was 7.13 +/- 0.74. The deltaE between foundry-ceram restorations and teeth was 1.47 +/- 0.84. There were statistical differences between the deltaE (P spectrophotometer can provide accurate reference for foundry-ceram restoration, but for metal-ceram restoration it is not accurate.

  6. EUV blank defect and particle inspection with high throughput immersion AFM with 1nm 3D resolution

    NARCIS (Netherlands)

    Es, M.H. van; Sadeghian Marnani, H.

    2016-01-01

    Inspection of EUV mask substrates and blanks is demanding. We envision this is a good target application for massively parallel Atomic Force Microscopy (AFM). We envision to do a full surface characterization of EUV masks with AFM enabling 1nm true 3D resolution over the entire surface. The limiting

  7. Wavelength-specific reflections: A decade of EUV actinic mask inspection research

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth; Mochi, Iacopo

    2010-12-31

    Mask inspection is essential for the success of any pattern-transfer lithography technology, and EUV Lithography in particular faces unique challenges. EUV masks resonant-reflective multilayer coatings have a narrow, wavelength-specific response that dramatically affects the way that defects appear, or disappear, at various illuminating wavelengths. Furthermore, the ever-shrinking size of 'critical' defects limits the potential effectiveness of DUV inspection techniques over time. Researchers pursuing numerous ways of finding and characterizing defects on EUV masks and have met with varying degrees of success. Their lessons inform the current, urgent exploration to select the most effective techniques for high-volume manufacturing. Ranging from basic research and demonstration experiments to commercial inspection tool prototypes, we survey the recent history of work in this area, including sixteen projects in Europe, Asia, and America. Solutions range from scanning beams to microscopy, dark field imaging to pattern transfer.

  8. Modeling of EUV emission and conversion efficiency from laser-produced tin plasmas for nanolithography

    Science.gov (United States)

    Harilal, S. S.; MacFarlane, J. J.; Golovkin, I. E.; Woodruff, P. R.; Wang, P.

    2008-03-01

    Extreme ultraviolet lithography (EUVL) is a leading candidate for use in next-generation high volume manufacturing of semiconductor chips that require feature sizes less than 32 nm. The essential requirement for enabling this technology is to have a reliable, clean and powerful EUV source which efficiently emits light at a wavelength of 13.5 nm. Laser-produced plasma EUV sources are strong candidates for use in EUVL light source systems. The development and optimization of high-efficiency EUV sources requires not only well-diagnosed experiments, but also a good understanding of the physical processes affecting the emitting plasma, which can be achieved with the help of accurate numerical simulation tools. Here, we investigate the radiative properties of tin and tin-doped foam plasmas heated by 1.06 μm laser beams with 10 ns pulse widths. Results from simulations are compared with experimental conversion efficiencies and emission spectra.

  9. Idea Sharing: Professionalizing ESP Teaching to University Students through Modeling Professional Interaction in ESP Classrooms

    Science.gov (United States)

    Tarnopolsky, Oleg

    2015-01-01

    The article discusses the implementation of the "constructivist approach" in ESP teaching to university students. This approach creates opportunities for students to "construct" their own target language communication skills meant for use in their professional intercourse. The way of achieving such an effect can be seen in…

  10. ESP8266 WI-FI MODULE FOR MONITORING SYSTEM APPLICATION

    OpenAIRE

    Tae-Gue Oh; Chung-Hyuk Yim; Gyu-Sik Kim

    2017-01-01

    The ESP8266 Wi-Fi module is a self-contained system-on-chip (SOC) with integrated TCP/IP protocol stacks that can give any microcontroller access to a Wi-Fi network. In this paper, the interface between the ESP8266 Wi-Fi module and arduino MCU is studied for monitoring system application. Through some experimental studies, we believe that the ESP8266 Wi-Fi module is very useful for monitoring system application.

  11. Lightness, chroma, and hue distributions in natural teeth measured by a spectrophotometer.

    Science.gov (United States)

    Pustina-Krasniqi, Teuta; Shala, Kujtim; Staka, Gloria; Bicaj, Teuta; Ahmedi, Enis; Dula, Linda

    2017-01-01

    The aim of the study was to analyze the distribution of color parameters, lightness (L*), chroma (C), hue (H), a* and b*, in the intercanine sector in maxilla. Patients' tooth color measurements were performed using an intraoral spectrophotometer VITA Easyshade® (VITA Zahnfabrik H. Rauter GmbH and Co. KG, Bad Sackingen, Germany). The measurements were made in 255 subjects in the intercanine sector in maxilla. The mean values for the group of 255 subjects were as follows: L*, a*, b*, C, and H as 81.6, 0.67, 21.6, 21.7, and 92.7, respectively. For F=206.27 and P < 0.001 between L*, a*, b*, C, H, and central incisor/lateral incisor/canines, there were statistically significant differences. With the statistical analysis, it was determined that there are significant color differences between the teeth of the intercanine sector, which differences are clinically significant also.

  12. A Study of UV Spectral Transmission Through Different Transparent Media with Spectrophotometer

    Directory of Open Access Journals (Sweden)

    R B Gadgil

    1981-01-01

    Full Text Available This experiment was carried out with the help of spectrophotometer using an artificial UV light source to find -out the percentage transmission of UVA and UVB regions of the UV spectrum. The aim of the experiment was to select the transparent medium which would block mum UVB at the same time allowing mammum UVA to pass through thus reducing the unwanted side effects of UVB light and reducing the efficacy of PUVASOL. It was observed that an ordinary plain 3.3 mm colorless glass was the best transparent medium and with its use a simple solarium could be constructed to treat patients on PUVASOL with sunlight as the source of UV light.

  13. Microvolume protein concentration determination using the NanoDrop 2000c spectrophotometer.

    Science.gov (United States)

    Desjardins, Philippe; Hansen, Joel B; Allen, Michael

    2009-11-04

    Traditional spectrophotometry requires placing samples into cuvettes or capillaries. This is often impractical due to the limited sample volumes often used for protein analysis. The Thermo Scientific NanoDrop 2000c Spectrophotometer solves this issue with an innovative sample retention system that holds microvolume samples between two measurement surfaces using the surface tension properties of liquids, enabling the quantification of samples in volumes as low as 0.5-2 microL. The elimination of cuvettes or capillaries allows real time changes in path length, which reduces the measurement time while greatly increasing the dynamic range of protein concentrations that can be measured. The need for dilutions is also eliminated, and preparations for sample quantification are relatively easy as the measurement surfaces can be simply wiped with laboratory wipe. This video article presents modifications to traditional protein concentration determination methods for quantification of microvolume amounts of protein using A280 absorbance readings or the BCA colorimetric assay.

  14. Design and evaluation of an imaging spectrophotometer incorporating a uniform light source.

    Science.gov (United States)

    Noble, S D; Brown, R B; Crowe, T G

    2012-03-01

    Accounting for light that is diffusely scattered from a surface is one of the practical challenges in reflectance measurement. Integrating spheres are commonly used for this purpose in point measurements of reflectance and transmittance. This solution is not directly applicable to a spectral imaging application for which diffuse reflectance measurements are desired. In this paper, an imaging spectrophotometer design is presented that employs a uniform light source to provide diffuse illumination. This creates the inverse measurement geometry to the directional illumination/diffuse reflectance mode typically used for point measurements. The final system had a spectral range between 400 and 1000 nm with a 5.2 nm resolution, a field of view of approximately 0.5 m by 0.5 m, and millimeter spatial resolution. Testing results indicate illumination uniformity typically exceeding 95% and reflectance precision better than 1.7%.

  15. Total ozone trends over the USA during 1979-1991 from Dobson spectrophotometer observations

    Science.gov (United States)

    Komhyr, Walter D.; Grass, Robert D.; Koenig, Gloria L.; Quincy, Dorothy M.; Evans, Robert D.; Leonard, R. Kent

    1994-01-01

    Ozone trends for 1979-1991, determined from Dobson spectrophotometer observations made at eight stations in the United States, are augmented with trend data from four foreign cooperative stations operated by NOAA/CMDL. Results are based on provisional data archived routinely throughout the years at the World Ozone Data Center in Toronto, Canada, with calibration corrections applied to some of the data. Trends through 1990 exhibit values of minus 0.3 percent to minus 0.5 percent yr(exp -1) at mid-to-high latitudes in the northern hemisphere. With the addition of 1991 data, however, the trends become less negative, indicating that ozone increased in many parts of the world during 1991. Stations located within the plus or minus 20 deg N-S latitude band exhibit no ozone trends. Early 1992 data show decreased ozone values at some of the stations. At South Pole, Antarctica, October ozone values have remained low during the past 3 years.

  16. Time resolved EUV pump-probe microscopy of fs-LASER induced nanostructure formation

    Science.gov (United States)

    Freiberger, R.; Hauck, J.; Reininghaus, M.; Wortmann, D.; Juschkin, L.

    2011-05-01

    We report on our efforts in design and construction of a compact Extreme Ultraviolet (EUV)-pump-probe microscope. The goal is the observation of formation of nanostructures, induced by a femtosecond (fs)-laser pulse. The unique interaction processes of fs-laser radiation with matter open up new markets in laser material processing and, therefore, are actively investigated in the last decade. The resulting "sub 100 nm"-structures offer vast potential benefits in photonics, biotechnology, tribological surface design, plasmonic applications and production of nanoparticles. Focused fs-laser radiation causes a local modification resulting in nanostructures of high precision and reproducibility. However the formation dynamics is not well understood. Research in this field requires high temporal and spatial resolution. A combination of fs-laser and EUV-microscope provides a tool for "in situ"-observation of the formation dynamics. As exemplary structures to be investigated, we use nanojets on thin gold films and periodic surface structures (ripples) on dielectrics. In the future, the EUV-pump-probe microscope can become a versatile tool to observe physical or biological processes. Microscopy using EUV-light is capable of detecting structures on a scale down to several tens of nanometers. For detailed investigations a compact EUV-microscope has been realized utilizing OVI Balmer-alpha radiation at 17.3 nm coming from a discharge produced oxygen plasma. As optical elements a grazing incidence elliptical collector and a zone plate with a width of outermost zone of 50 nm and a spectral filter to avoid chromatic aberrations are used. The detector is a fast gated microchannel plate with a pore size of 2 microns contacted by a low impedance transmission line. The expected spatial resolution of the setup is better than 100 nm and the time resolution is better than 1 ns. The newly developed EUV-microscope is a powerful tool for a wide field of investigations that need high time

  17. New method of detection and classification of yield-impacting EUV mask defects

    Science.gov (United States)

    Graur, Ioana; Vengertsev, Dmitry; Raghunathan, Ananthan; Stobert, Ian; Rankin, Jed

    2015-10-01

    Extreme ultraviolet lithography (EUV) advances printability of small size features for both memory and logic semiconductor devices. It promises to bring relief to the semiconductor manufacturing industry, removing the need for multiple masks in rendering a single design layer on wafer. However, EUV also brings new challenges, one of which is of mask defectivity. For this purpose, much of the focus in recent years has been in finding ways to adequately detect, characterize, and reduce defects on both EUV blanks and patterned masks. In this paper we will present an efficient way to classify and disposition EUV mask defects through a new algorithm developed to classify defects located on EUV photomasks. By processing scanning electronmicroscopy images (SEM) of small regions of a photomask, we extract highdimensional local features Histograms of Oriented Gradients (HOG). Local features represent image contents compactly for detection or classification, without requiring image segmentation. Using these HOGs, a supervised classification method is applied which allows differentiating between nondefective and defective images. In the new approach we have developed a superior method of detection and classification of defects, using mask and supporting mask printed data from several metallization masks. We will demonstrate that use of the HOG method allows realtime identification of defects on EUV masks regardless of geometry or construct. The defects identified by this classifier are further divided into subclasses for mask defect disposition: foreign material, foreign material from previous step, and topological defects. The goal of disposition is to categorize on the images into subcategories and provide recommendation of prescriptive actions to avoid impact on the wafer yield.

  18. Preparations for EUV interferometry of the 0.3 NA MET optic

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Naulleau, Patrick P.; Denham, Paul E.; Rekawa, Senajith B.; Jackson, Keith H.; Liddle, J. Alexander; Harteneck, Bruce; Gullikson, Eric; Anderson, Erik H.

    2003-10-30

    An at-wavelength interferometer is being created for the measurement and alignment of the 0.3 numerical aperture Micro Exposure Tool projection optic at EUV wavelengths. The prototype MET system promises to provide early learning from EUV lithographic imaging down to 20-nm feature size. The threefold increase to 0.3 NA in the image-side numerical aperture presents several challenges for the extension of ultra-high-accuracy interferometry, including pinhole fabrication and the calibration and removal of systematic error sources.

  19. Numerical and experimental studies of the carbon etching in EUV-induced plasma

    CERN Document Server

    Astakhov, D I; Lee, C J; Ivanov, V V; Krivtsun, V M; Yakushev, O; Koshelev, K N; Lopaev, D V; Bijkerk, F

    2015-01-01

    We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy resolved ion fluxes from the plasma to the surface. By relating the computed ion fluxes to the experimentally observed etching rate at various pressures and ion energies, we show that at low pressure and energy, carbon etching is due to chemical sputtering, while at high pressure and energy a reactive ion etching process is likely to dominate.

  20. Development of a low-cost NIR instrument for minced meat analysis: Part 1 - Spectrophotometer and sample presentations

    Science.gov (United States)

    The feasibility of using a compact, low-cost NIR spectrophotometer to predict moisture (MC) and total fat content of minced pork was demonstrated. Results were compared with those obtained using two research type instruments with high signal to noise ratio (S/N). The NIR measuring head of the compac...

  1. Photochemical induced growth and aggregation of metal nanoparticles in diode-array spectrophotometer via excited dimethyl-sulfoxide.

    Science.gov (United States)

    Zidki, Tomer; Cohen, Haim; Meyerstein, Dan

    2010-10-21

    Ag(0) and Au(0) nanoparticles suspended in dilute aqueous solutions containing (CH(3))(2)SO are photochemically unstable. The light source of a diode-array spectrophotometer induces, within less than a minute, particle growth and aggregation. The results indicate that this process is triggered by UV light absorption by the (CH(3))(2)SO.

  2. A low cost short wave near infrared spectrophotometer: application for determination of quality parameters of diesel fuel.

    Science.gov (United States)

    Gonzaga, Fabiano Barbieri; Pasquini, Celio

    2010-06-18

    A low cost absorption spectrophotometer for the short wave near infrared spectral region (850-1050 nm) is described. The spectrophotometer is basically composed of a conventional dichroic lamp, a long-pass filter, a sample cell and a Czerny-Turner type polychromator coupled to a 1024 pixel non-cooled photodiode array. A preliminary evaluation of the spectrophotometer showed good repeatability of the first derivative of the spectra at a constant room temperature and the possibility of assigning some spectral regions to different C-H stretching third overtones. Finally, the spectrophotometer was successfully applied for the analysis of diesel samples and the determination of some of their quality parameters using partial least squares calibration models. The values found for the root mean square error of prediction using external validation were 0.5 for the cetane index and from 2.5 to 5.0 degrees C for the temperatures achieved during distillation when obtaining 10, 50, 85, and 90% (v/v) of the distilled sample, respectively. 2010 Elsevier B.V. All rights reserved.

  3. Assessing the Engagement, Learning, and Overall Experience of Students Operating an Atomic Absorption Spectrophotometer with Remote Access Technology

    Science.gov (United States)

    Erasmus, Daniel J.; Brewer, Sharon E.; Cinel, Bruno

    2015-01-01

    The use of internet-based technologies in the teaching of laboratories has emerged as a promising education tool. This study evaluated the effectiveness of using remote access technology to operate an atomic absorption spectrophotometer in analyzing the iron content in a crude myoglobin extract. Sixty-two students were surveyed on their level of…

  4. Design of a novel laser-induced fluorescence spectrophotometer for water quality monitor based on virtual instrument and linear CCD

    Science.gov (United States)

    Ren, Zhong; Huang, Shuanggen; Liu, Guodong; Huang, Zhen; Zeng, Lvming

    2011-06-01

    Since the water resource is being seriously polluted with the development of the human society, the monitoring of the available water resource is an impending task. The concentration of the dissolved organic matter, oxygen and inorganic salt in water can be checked by means of some methods, e.g. electrolysis, electrochemical method, colorimetry. But because some drawbacks are existed in these methods, the laser-induced fluorescence (LIF) spectrophotometry method is adopted into this paper. And a novel LIF spectrophotometer for water quality monitor (WQM) is designed. In this WQM, the 3rd harmonic of the Q switched Nd:YAG laser is used as the induced fluorescence light-source. And for the splitting-light system of the spectrophotometer for WQM, in order to improve the resolution and light-passing efficiency, a novel volume holography transmissive(VHT) grating is used as the diffraction grating instead of the plane or holography grating. Meanwhile, the linear CCD with combined data acquisition (DAQ) card is used as the fluorescence spectral detection system and virtual instrument (VI) technology based on LabVIEW is used to control the spectral acquisition and analysis. Experimental results show that the spatial resolution of the novel spectrophotometer for WQM is improved, its resolution can reach 2nm. And the checking accuracy of this WQM is higher than others. Therefore, the novel LIF spectrophotometer for WQM has the potential value in the water quality monitoring and biochemical application.

  5. The Impact of Mobile Learning on ESP Learners' Performance

    Science.gov (United States)

    Alkhezzi, Fahad; Al-Dousari, Wadha

    2016-01-01

    This study explores the impact of using mobile phone applications, namely Telegram Messenger, on teaching and learning English in an ESP context. The main objective is to test whether using mobile phone applications have an impact on ESP learners' performance by mainly investigating the influence such teaching technique can have on learning…

  6. An Overview of ESP in the 1990s.

    Science.gov (United States)

    Dudley-Evans, Tony

    This discussion of the current state of instruction in English for Special Purposes (ESP) begins with a comprehensive definition of ESP that focuses on characteristics distinguishing it from other areas of English language teaching: specific language skill needs; specific genres and language related to them; and methodology reflecting the…

  7. Dissolution of heavy metals from electrostatic precipitator (ESP) dust ...

    African Journals Online (AJOL)

    Coal based sponge iron industries in India generate considerable quantity of solid waste, 40% of which is flue dust produced from the electrostatic precipitator (ESP) connected to rotary kiln. This paper reports the dissolution of Zn, Cu, Pb, Mn and Fe from the ESP dust using three fungal species, Aspergillus niger, ...

  8. The Most Prominent Roles of an ESP Teacher

    Science.gov (United States)

    Ghafournia, Narjes; Sabet, Shokoofeh Ahmadian

    2014-01-01

    One prominent feature of many ESP (English for Specific Purposes) courses, which make them rather different from EGP (English for General Purposes) courses, is the presence of adult learners, who are primary workers and secondary learners. As ESP is a highly learner-cantered approach, paying close attention to the multidimensional needs of…

  9. English for Specific Purposes (ESP): A Holistic Review

    Science.gov (United States)

    Rahman, Momtazur

    2015-01-01

    English for Specific Purposes, known as acronym-"ESP", has been a distinct activity in the field of English Language Teaching (ELT) since 1960s. The flowering period of ESP has been identified due to many incidents like the second world war in 1945, the rapid expansion in scientific, the growth of science and technology, the increased…

  10. Identification and Validation of ESP Teacher Competencies: A Research Design

    Science.gov (United States)

    Venkatraman, G.; Prema, P.

    2013-01-01

    The paper presents the research design used for identifying and validating a set of competencies required of ESP (English for Specific Purposes) teachers. The identification of the competencies and the three-stage validation process are also discussed. The observation of classes of ESP teachers for field-testing the validated competencies and…

  11. Dissolution of heavy metals from electrostatic precipitator (ESP) dust ...

    African Journals Online (AJOL)

    SIBOO

    Coal based sponge iron industries in India generate considerable quantity of solid waste, 40% of which is flue dust produced from the electrostatic precipitator (ESP) connected to rotary kiln. This paper reports the dissolution of Zn, Cu, Pb, Mn and Fe from the ESP dust using three fungal species, Aspergillus niger,.

  12. ESP Teaching and Needs Analysis. Case Study

    Directory of Open Access Journals (Sweden)

    Nădrag Lavinia

    2017-01-01

    Full Text Available This paper explores the characteristics of the English language for Specific Purposes (ESP, the difficulties and challenges faced when teaching English as a foreign language, and the importance of Needs Analysis in learning a foreign language. For this purpose, we applied a questionnaire to a group of intermediate level (B1 students, majoring in Tourism. The needs analysis revealed the approaches and activities that should be applied in different types of lessons, thus giving the students the opportunity to improve their English skills and find out what they lack and need when studying English for their future professional careers. The results outlined the need for concrete activities and strategies, with the focus on communicative skills, based on learner-centered approaches and activities, real-life situations by using authentic materials that are efficient for the students’ better integration into the Tourism labor market.

  13. The current challenges of teaching ESP

    Science.gov (United States)

    Fălăuş, A.

    2017-05-01

    Although the status of lingua franca can easily be claimed by English nowadays, there are always plenty of challenges involved in the process of teaching a foreign language. The simple mastering of the four skills (reading, writing, listening and speaking) and the acquisition of general grammar and vocabulary may not be enough in some circumstances. ESP focuses on the specific needs of the learners, concentrating more on language in context and on the students’ need to acquire a set of professional skills and particular job-related functions. This paper, consequently, focuses on identifying the current challenges that teachers and students may encounter in the process of teaching and learning English for Specific Purposes.

  14. EUV mask pattern inspection with an advanced electron beam inspection system

    Science.gov (United States)

    Shimomura, Takeya; Inazuki, Yuichi; Tsukasa, Abe; Takikawa, Tadahiko; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya; Wang, Fei; Ma, Long; Zhao, Yan; Kuan, Chiyan; Xiao, Hong; Jau, Jack

    2009-12-01

    Readiness of defect-free mask is one of the biggest challenges to insert extreme ultraviolet (EUV) lithography into semiconductor high volume manufacturing for 22nm half pitch (HP) node and beyond. According to ITRS roadmap updated in 2008, minimum size of defect needed to be removed is 25nm for 22nm HP node in 2013 [1]. It is necessary, therefore, to develop EUV mask pattern inspection tool being capable of detecting 25nm defect. Electron beam inspection (EBI) is one of promising tools which will be able to meet such a tight defect requirement. In this paper, we evaluated defect detection sensitivity of electron beam inspection (EBI) system developed by Hermes Microvision, Inc. (HMI) using 88nm half-pitch (HP) line-and-space (L/S) pattern and 128nm HP contact-hole (C/H) pattern EUV mask. We found the EBI system can detect 25nm defects. We, furthermore, fabricated 4 types of EUV mask structures: 1) w/ anti-reflective (AR) layer and w/ buffer layer, 2) w/ AR layer and w/o buffer layer, 3) w/o AR layer and w/ buffer layer, 4) w/o AR layer and w/o buffer layer. And the sensitivity and inspectability for the EBI were compared. It was observed that w/o AR layer structure introduce higher image contrast and lead to better inspectability, although there is no significant different in sensitivity.

  15. Progress in resolution, sensitivity, and critical dimensional uniformity of EUV chemically amplified resists

    Science.gov (United States)

    Thackeray, James; Cameron, James; Jain, Vipul; LaBeaume, Paul; Coley, Suzanne; Ongayi, Owendi; Wagner, Mike; Rachford, Aaron; Biafore, John

    2013-03-01

    This paper will discuss further progress obtained at Dow for the improvement of the Resolution, Contact critical dimension uniformity(CDU), and Sensitivity of EUV chemically amplified resists. For resolution, we have employed the use of polymer-bound photoacid generator (PBP) concept to reduce the intrinsic acid diffusion that limits the ultimate resolving capability of CA resists. For CDU, we have focused on intrinsic dissolution contrast and have found that the photo-decomposable base (PDB) concept can be successfully employed. With the use of a PDB, we can reduce CDU variation at a lower exposure energy. For sensitivity, we have focused on more efficient EUV photon capture through increased EUV absorption, as well as more highly efficient PAGs for greater acid generating efficiency. The formulation concepts will be confirmed using Prolith stochastic resist modeling. For the 26nm hp contact holes, we get excellent overall process window with over 280nm depth of focus for a 10% exposure latitude Process window. The 1sigma Critical dimension uniformity [CDU] is 1.1 nm. We also obtain 20nm hp contact resolution in one of our new EUV resists.

  16. RapidNano: towards 20nm Particle Detection on EUV Mask Blanks

    NARCIS (Netherlands)

    Donck, J.C.J. van der; Bussink, P.G.W.; Fritz, E.C.; Walle, P. van der

    2016-01-01

    Cleanliness is a prerequisite for obtaining economically feasible yield levels in the semiconductor industry. For the next generation of lithographic equipment, EUV lithography, the size of yield-loss inducing particles for the masks will be smaller than 20 nm. Consequently, equipment for handling

  17. Investigating the intrinsic cleanliness of automated handling designed for EUV mask Pod-in-Pod systems

    NARCIS (Netherlands)

    Brux, O.; Walle, P. van der; Donck, J.C.J. van der; Dress, P.

    2011-01-01

    Extreme Ultraviolet Lithography (EUVL) is the most promising solution for technology nodes 16nm (hp) and below. However, several unique EUV mask challenges must be resolved for a successful launch of the technology into the market. Uncontrolled introduction of particles and/or contamination into the

  18. Cross-Calibration of the GOES-R SUVI with On-Orbit Solar EUV Instruments

    Science.gov (United States)

    Darnel, Jonathan; Seaton, Daniel B.

    2016-05-01

    Maintaining the calibration of on-orbit instruments has always been a challenge, but one which is crucial for the accuracy of the data record. This challenge is magnified for solar Extreme UltraViolet (EUV) instruments. Absolute calibration is out of the question as stable and known sources of EUV irradiance are not practical in on-orbit environments. This leaves relative calibration against other solar EUV instruments whose calibration has been well tracked. The need for such cross-calibration efforts is especially acute for an instrument like the Solar Ultraviolet Imager (SUVI), which will fly on the GOES-R spacecraft later this year and is expected to provide two decades of solar observation between four identical instruments. Not only must calibration between the four instruments in the SUVI line be maintained, but the relative calibration between SUVI and both present day imagers like SDO/AIA and PROBA2/SWAP and future instruments yet to be developed must be established as well. We present the methodology developed using current on-orbit solar EUV instruments in order to maintain the calibration of the SUVI instruments.

  19. SoFAST: Automated Flare Detection with the PROBA2/SWAP EUV Imager

    Science.gov (United States)

    Bonte, K.; Berghmans, D.; De Groof, A.; Steed, K.; Poedts, S.

    2013-08-01

    The Sun Watcher with Active Pixels and Image Processing (SWAP) EUV imager onboard PROBA2 provides a non-stop stream of coronal extreme-ultraviolet (EUV) images at a cadence of typically 130 seconds. These images show the solar drivers of space-weather, such as flares and erupting filaments. We have developed a software tool that automatically processes the images and localises and identifies flares. On one hand, the output of this software tool is intended as a service to the Space Weather Segment of ESA's Space Situational Awareness (SSA) program. On the other hand, we consider the PROBA2/SWAP images as a model for the data from the Extreme Ultraviolet Imager (EUI) instrument prepared for the future Solar Orbiter mission, where onboard intelligence is required for prioritising data within the challenging telemetry quota. In this article we present the concept of the software, the first statistics on its effectiveness and the online display in real time of its results. Our results indicate that it is not only possible to detect EUV flares automatically in an acquired dataset, but that quantifying a range of EUV dynamics is also possible. The method is based on thresholding of macropixelled image sequences. The robustness and simplicity of the algorithm is a clear advantage for future onboard use.

  20. The EUV Spectrum of Sunspot Plumes Observed by SUMER on SOHO

    Indian Academy of Sciences (India)

    In sunspot plumes the EUV spectrum differs from the quiet Sun; continua are observed with different slopes and intensities; emission lines from molecular hydrogen and many unidentified species indicate unique plasma conditions above sunspots. Sunspot plumes are sites of systematic downflow. We also discuss the ...

  1. Sub-hundred Watt operation demonstration of HVM LPP-EUV source

    Science.gov (United States)

    Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu; Ohta, Takeshi; Nowak, Krzysztof M.; Kawasuji, Yasufumi; Tanaka, Hiroshi; Watanabe, Yukio; Hori, Tsukasa; Kodama, Takeshi; Shiraishi, Yutaka; Yanagida, Tatsuya; Yamada, Tsuyoshi; Yamazaki, Taku; Okazaki, Shinji; Saitou, Takashi

    2014-04-01

    Since 2002, we have been developing a CO2-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO2 laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO2 laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO2 amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO2 laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy 1). In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO2 laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO2 laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP

  2. Evaluation of ESP Teachers in Different Contexts of Iranian Universities

    Directory of Open Access Journals (Sweden)

    Maryam Sherkatolabbasi

    2012-07-01

    Full Text Available In countries where English is mainly used for academic purposes, such as Iran, ESP plays a highly important role. In Iran, there are three major different contexts of ESP in which content teachers, language teachers, and professional ESP teachers at Language Departments of each discipline teach ESP. The present study intends to evaluate teachers in the three mentioned ESP contexts at several Iranian universities such as Shahid Beheshti, Esfahan, and Guilan Universities. For this purpose, at the first stage, 15 teachers and 30 students were interviewed and 20 classes were observed. At the second stage, 470 teachers and students of Medical and Para-medical Faculties were asked to participate in the study. A survey was run through distributing a 101-item questionnaire for teachers and an 83-item one for students, each one was checked through a pilot study and with a high reliability, among the participants. The results indicate teachers’ and students’ opinions of the current situation regarding their ESP context, especially the methodology, matched with each other. The results concerning the three contexts showed that context of Language Departments in each discipline is the most effective one as far as ESP teaching parameters are concerned and students and ESP teachers at Language Departments were mostly satisfied with their courses. On the other hand, the context of content teachers is the least effective one with the most problematic areas. This suggests that if ESP courses are offered by professional ESP teachers of Language Departments in each faculty, the shortcomings could be minimized.

  3. Four Years of EUVE Observations of the Bursting Gamma-Ray Emitting Blazar Markarian 421

    Science.gov (United States)

    Cagnoni, Ilaria; Fruscione, Antonella; Papadakis, Iossif

    1998-01-01

    We present spectral and timing analysis of all the data collected by the Extreme Ultraviolet Explorer Satellite (EUVE) for the bright, nearby BL Lacertae object, Markarian 421, during the four-year period 1994-1997. During these years Mrk 421 has been observed by EUVE 4 times with the Deep-Survey/Spectrograph and 2 times with the imaging telescopes for a total of approximately 1.4 7nillions seconds. From 1993 to 1996 three very bright gamma ray flares were also detected by the Whipple observatory. In 1994 Mrk 421 was observed simultaneously by EUVE (Apr 2-12) and IUE one month before the TeV flare; of the 2 EUVF, observations (Feb 4-7 and Apr 25-May 13) of 1995, the second was part of a multiwavelength campaign that mapped the evolution of the TeV flare. In 1996 we observed Mrk 421 twice simultaneously with XTE: one immediately before (Apr 17-30) and another one (May 10-11) right after the May 7 1996 TeV flare. And finally in 1997 from Feb. 7 to Feb. ll. The total light curve seems to be smoothly varying on the long time-scale while on a shorter time-scale there is evidence of an EUVE flare well correlated to the TeV energy 1995 flare. We have analysed the three spectral data set in an homogenous way using the appropriate calibration data for the off-axis observations and our analysis confirms the presence of the absorption features around approximately 70A, in the entire 1995 dataset and possibly in the 1996 data set. We also show the first power spectrum analysis of the Mrk 421 EUVE lightcurves and a comparison with the power spectra predicted by current theoretical models.

  4. Innovative CEA Information Server: Helping K--12 Teachers and Students Navigate the EUVE Mission Archive

    Science.gov (United States)

    Kronberg, F.; Hawkins, I.; Levandovsky, N.; Wong, L.; Arellano, V.; Ford, P.; Nguyen, K.; Malina, R. F.

    1995-12-01

    Internet access to the Extreme Ultraviolet Explorer (EUVE) mission archive for participants in the Science Online and Science Information Infrastructure programs will be facilitated by an innovative, World Wide Web--based data server being developed at the UC Berkeley Center for EUV Astrophysics (CEA). The Innovative CEA Information Server, being developed for the Science Education Program, will allow the user to easily select and access material from the EUVE mission archive. The entire archive, as part of an overarching CEA project, the EUVE Knowledge Base, will be logically structured into knowledge units. Each knowledge unit is defined as ``all of the information available at CEA about a given subject encapsulated into a self-contained, single, multimedia object.'' The user will be able to specify parameters that indicate the desired levels of complexity, breadth or scope, and format (e.g., text or graphics) of the requested knowledge units. The K--12 education materials for this Server are being developed at CEA via a ``Partners in Science'' teacher internship program funded by Research Corporation. Dr. Nelli Levandovsky, a physics teacher from San Francisco Unified School District's Galileo high school, created the following two tutorial plans this past summer: ``Be an Engineer---Learn How to Operate a Satellite'' and ``Be a Scientist---Learn How to Become a Space Researcher.'' Current development efforts are concentrated in two areas: (1) reviewing types of EUVE archival data and mission information and how these knowledge units can be packaged and presented; and (2) investigating how issues of breadth (e.g., scope or extent) and depth (e.g., complexity) of the knowledge units can be better presented in the construction of the Server. This work is supported by NASA contract NAS5-29298.

  5. Comparison of ozone retrievals from the Pandora spectrometer system and Dobson spectrophotometer in Boulder, Colorado

    Science.gov (United States)

    Herman, J.; Evans, R.; Cede, A.; Abuhassan, N.; Petropavlovskikh, I.; McConville, G.

    2015-08-01

    A comparison of retrieved total column ozone (TCO) amounts between the Pandora #34 spectrometer system and the Dobson #061 spectrophotometer from direct-sun observations was performed on the roof of the Boulder, Colorado, NOAA building. This paper, part of an ongoing study, covers a 1-year period starting on 17 December 2013. Both the standard Dobson and Pandora TCO retrievals required a correction, TCOcorr = TCO (1 + C(T)), using a monthly varying effective ozone temperature, TE, derived from a temperature and ozone profile climatology. The correction is used to remove a seasonal difference caused by using a fixed temperature in each retrieval algorithm. The respective corrections C(TE) are CPandora = 0.00333(TE-225) and CDobson = -0.0013(TE-226.7) per degree K. After the applied corrections removed most of the seasonal retrieval dependence on ozone temperature, TCO agreement between the instruments was within 1 % for clear-sky conditions. For clear-sky observations, both co-located instruments tracked the day-to-day variation in total column ozone amounts with a correlation of r2 = 0.97 and an average offset of 1.1 ± 5.8 DU. In addition, the Pandora TCO data showed 0.3 % annual average agreement with satellite overpass data from AURA/OMI (Ozone Monitoring Instrument) and 1 % annual average offset with Suomi-NPP/OMPS (Suomi National Polar-orbiting Partnership, the nadir viewing portion of the Ozone Mapper Profiler Suite).

  6. Optofluidic UV-Vis spectrophotometer for online monitoring of photocatalytic reactions

    Science.gov (United States)

    Wang, Ning; Tan, Furui; Zhao, Yu; Tsoi, Chi Chung; Fan, Xudong; Yu, Weixing; Zhang, Xuming

    2016-01-01

    On-chip integration of optical detection units into the microfluidic systems for online monitoring is highly desirable for many applications and is also well in line with the spirit of optofluidics technology–fusion of optics and microfluidics for advanced functionalities. This paper reports the construction of a UV-Vis spectrophotometer on a microreactor, and demonstrates the online monitoring of the photocatalytic degradations of methylene blue and methyl orange under different flow rates and different pH values by detecting the intensity change and/or the peak shift. The integrated device consists of a TiO2-coated glass substrate, a PDMS micro-sized reaction chamber and two flow cells. By comparing with the results of commercial equipment, we have found that the measuring range and the sensitivity are acceptable, especially when the transmittance is in the range of 0.01–0.9. This integrated optofluidic device can significantly cut down the test time and the sample volume, and would provide a versatile platform for real-time characterization of photochemical performance. Moreover, its online monitoring capability may enable to access the usually hidden information in biochemical reactions like intermediate products, time-dependent processes and reaction kinetics. PMID:27352840

  7. Improved retrieval of nitrogen dioxide (NO2) column densities by means of MKIV Brewer spectrophotometers

    Science.gov (United States)

    Diémoz, H.; Siani, A. M.; Redondas, A.; Savastiouk, V.; McElroy, C. T.; Navarro-Comas, M.; Hase, F.

    2014-11-01

    A new algorithm to retrieve nitrogen dioxide (NO2) column densities using MKIV ("Mark IV") Brewer spectrophotometers is described. The method includes several improvements, such as a more recent spectroscopic data set, the reduction of measurement noise, interference by other atmospheric species and instrumental settings, and a better determination of the zenith sky air mass factor. The technique was tested during an ad hoc calibration campaign at the high-altitude site of Izaña (Tenerife, Spain) and the results of the direct sun and zenith sky geometries were compared to those obtained by two reference instruments from the Network for the Detection of Atmospheric Composition Change (NDACC): a Fourier Transform Infrared Radiometer (FTIR) and an advanced visible spectrograph (RASAS-II) based on the differential optical absorption spectrometry (DOAS) technique. To determine the extraterrestrial constant, an easily implementable extension of the standard Langley technique for very clean sites without tropospheric NO2 was developed which takes into account the daytime linear drift of stratospheric nitrogen dioxide due to photochemistry. The measurement uncertainty was thoroughly determined by using a Monte Carlo technique. Poisson noise and wavelength misalignments were found to be the most influential contributors to the overall uncertainty, and possible solutions are proposed for future improvements. The new algorithm is backward-compatible, thus allowing for the reprocessing of historical data sets.

  8. Flavonoids content in extracts secang (Caesalpinia Sappan L. maceration method infundation analysis and visible ultraviolet spectrophotometer

    Directory of Open Access Journals (Sweden)

    Youstiana Dwi Rusita

    2016-04-01

    Full Text Available Secang (Caesalpinia sappan L has a component of a chemical compound essential oils, flavonoids, benzopyran, sapanin, brazilin, caesalpin S, caesalpin P, sapanon A, sapanon B. Flavonoids are chemical components that can be used in medical and industrial fields. This study aimed to determine the levels of flavonoids contained in extracts secang results maceration and extraction methods infundation. This study used quantitative and descriptive research design. This study using purposive sampling with two sample of Caesalpinia sappan L extract result of infundation and maceration. Analysis using univariate analysis. This study shows that there are types of flavonoids flavones, flavonols and flavanols on extracts of Caesalpinia sappan L results maceration method, and there are flavonoid types of flavones, flavonols and flavanols on extracts of Caesalpinia sappan L results infundation method. Flavonoid content test results showed that the levels of flavonoids in extracts of Caesalpinia sappan L results maceration 0.0539% whereas the levels of flavonoids in the extract of Caesalpinia sappan L results infundation methods 0.1902%. Necessary standardization of botanicals Caesalpinia sappan L to determine the levels of flavonoids using ultraviolet visible spectrophotometer, and the analysis of the levels of flavonoids in the extract of Caesalpinia sappan L using different solvents. As a follow-up is necessary to design the manufacture of dosage formulations of the active ingredient flavanoid compounds from the extract of Caesalpinia sappan L.

  9. The effect of experience on composite resin shade selection in comparison to a spectrophotometer

    Directory of Open Access Journals (Sweden)

    Duygu Recen

    2016-01-01

    Full Text Available OBJECTIVE: The objective of this study was to compare the shade matching ability of dentists with different experience levels in comparison to a spectrophotometer. MATERIALS AND METHOD: Participants were selected from the volunteer fourth grade students of Faculty of Dentistry, Ege University (n=100. A fifthyear undergraduate student, a research assistant with 2 years of experience and two professors of restorative dentistry with at least 10 years of experience were included in this study as observers. Ishihara color blindness test was applied to all observers before taking shades. After taking the shades with conventional method by using Vita Classical shade guide, the research assistant took the shades again with SpectroShade Micro device. Agreement on shade matches was evaluated by percentage and compared using Wilcoxon test (p0.05 and the correct match rate of the research assistant was superior to the others. Statistically significant differences were found between the fifth grade student’s shade assignments and the research assistant’s assignments as well as the device’s readings (p<0.05. CONCLUSION: Within the limitations of this study, it was concluded that shade matching is a learnable process. In order to do a correct shade match in complicated situations, dentists may refer to spectrophotometric devices.

  10. Comparison of Shade of Ceramic with Three Different Zirconia Substructures using Spectrophotometer.

    Science.gov (United States)

    Habib, Syed Rashid; Shiddi, Ibraheem F Al

    2015-02-01

    This study assessed how changing the Zirconia (Zr) substructure affected the color samples after they have been overlaid by the same shade of veneering ceramic. Three commercial Zr materials were tested in this study: Prettau(®) Zirconia (ZirKonZahn, Italy), Cercon (Dentsply, Germany) and InCoris ZI (Sirona, Germany). For each system, 15 disk-shaped specimens (10 × 1 mm) were fabricated. Three shades of A1, A2 and A3.5 of porcelain (IPS e.MaxCeram, IvoclarVivadent, USA) were used for layering the specimens. Five specimens from each type of Zr were layered with same shade of ceramic. Color measurements were recorderd by a spectrophotometer Color-Eye(®) 7000A (X-Rite, Grand Rapids, MI). Mean values of L, a, b color coordinates and ΔE were recorded and comparisons were made. Differences in the ΔE were recorded for the same porcelain shade with different Zr substructures and affected the color of the specimens (p Zirconia substructure were found to be the least among the three types. The brand of Zr used influences the final color of the all ceramic Zr based restorations and this has clinical significance.

  11. Sensitive determination of mercury by a miniaturized spectrophotometer after in situ single-drop microextraction.

    Science.gov (United States)

    Yang, Fangwen; Liu, Rui; Tan, Zhiqiang; Wen, Xiaodong; Zheng, Chengbin; Lv, Yi

    2010-11-15

    An in situ single-drop microextraction (SDME) method was developed for trace mercury determination by a miniaturized spectrophotometer, in which a simple and cheap light-emitting diode (LED) was employed as the light source, and a handheld charge coupled device (CCD) was served as the detector. A droplet of 0.006% dithizone-CCl(4) (m/v) was used as extraction phase and hanged on a rolled PTFE tube. LED light was adjusted carefully to pass through the centre of the droplet and the entrance slit of the CCD detector. The radiation intensities of 475 nm before and after SDME (I(0) and I(i)) were recorded for quantification. Under the optimum conditions, the system provided a linear range of 2-50 μg L(-1), with a correlation coefficient of 0.9983 and a limit of detection (3σ) of 0.2 μg L(-1). The enrichment factor was about 69. The present method showed the merits of high sensitivity, simplicity, rapidity, low reagent consumption and field analysis potential. Finally, this method was successfully applied for the determination of the total mercury in spiked tap water sample, spiked river water sample and certified reference material (GBW (E) 080393, simulated water). Copyright © 2010 Elsevier B.V. All rights reserved.

  12. Optofluidic UV-Vis spectrophotometer for online monitoring of photocatalytic reactions.

    Science.gov (United States)

    Wang, Ning; Tan, Furui; Zhao, Yu; Tsoi, Chi Chung; Fan, Xudong; Yu, Weixing; Zhang, Xuming

    2016-06-29

    On-chip integration of optical detection units into the microfluidic systems for online monitoring is highly desirable for many applications and is also well in line with the spirit of optofluidics technology-fusion of optics and microfluidics for advanced functionalities. This paper reports the construction of a UV-Vis spectrophotometer on a microreactor, and demonstrates the online monitoring of the photocatalytic degradations of methylene blue and methyl orange under different flow rates and different pH values by detecting the intensity change and/or the peak shift. The integrated device consists of a TiO2-coated glass substrate, a PDMS micro-sized reaction chamber and two flow cells. By comparing with the results of commercial equipment, we have found that the measuring range and the sensitivity are acceptable, especially when the transmittance is in the range of 0.01-0.9. This integrated optofluidic device can significantly cut down the test time and the sample volume, and would provide a versatile platform for real-time characterization of photochemical performance. Moreover, its online monitoring capability may enable to access the usually hidden information in biochemical reactions like intermediate products, time-dependent processes and reaction kinetics.

  13. A study of a sector spectrophotometer and auroral O+(2P-2D) emissions

    Science.gov (United States)

    Swenson, G. R.

    1976-01-01

    The metastable O+(2P-2D) auroral emission was investigated. The neighboring OH contaminants and low intensity levels of the emission itself necessitated the evolution of an instrument capable of separating the emission from the contaminants and having a high sensitivity in the wavelength region of interest. A new type of scanning photometer was developed and its properties are discussed. The theoretical aspects of auroral electron interaction with atomic oxygen and the resultant O+(2P-2D) emissions were examined in conjunction with N2(+)1NEG emissions. Ground based measurements of O+(2P-2D) auroral emission intensities were made using the spatial scanning photometer (sector spectrophotometer). Simultaneous measurements of N2(+)1NEG sub 1,0 emission intensity were made in the same field of view using a tilting photometer. Time histories of the ratio of these two emissions made in the magnetic zenith during auroral breakup periods are given. Theories of I sub 7319/I sub 4278 of previous investigators were presented. A rocket measurement of N2(+)1NEG sub 0,0 and O+(2P-2D) emission in aurora was examined in detail and was found to agree with the ground based measurements. Theoretical examination resulted in the deduction of the electron impact efficiency generating O+(2P) and also suggests a large source of O+(2P) at low altitude. A possible source is charge exchange of N+(1S) with OI(3P).

  14. Outdoor solar UVA dose assessment with EBT2 radiochromic film using spectrophotometer and densitometer measurements.

    Science.gov (United States)

    Abukassem, I; Bero, M A

    2015-04-01

    Direct measurements of solar ultraviolet radiations (UVRs) have an important role in the protection of humans against UVR hazard. This work presents simple technique based on the application of EBT2 GAFCHROMIC(®) film for direct solar UVA dose assessment. It demonstrates the effects of different parts of the solar spectrum (UVB, visible and infrared) on performed UVA field measurements and presents the measurement uncertainty budget. The gradient of sunlight exposure level permitted the authors to establish the mathematical relationships between the measured solar UVA dose and two measured quantities: the first was the changes in spectral absorbance at the wavelength 633 nm (A633) and the second was the optical density (OD). The established standard relations were also applied to calculate the solar UVA dose variations during the whole day; 15 min of exposure each hour between 8:00 and 17:00 was recorded. Results show that both applied experimental methods, spectrophotometer absorbance and densitometer OD, deliver comparable figures for EBT2 solar UVA dose assessment with relative uncertainty of 11% for spectral absorbance measurements and 15% for OD measurements. © The Author 2014. Published by Oxford University Press. All rights reserved. For Permissions, please email: journals.permissions@oup.com.

  15. Determination of nanomolar chromate in drinking water with solid phase extraction and a portable spectrophotometer.

    Science.gov (United States)

    Ma, Jian; Yang, Bo; Byrne, Robert H

    2012-06-15

    Determination of chromate at low concentration levels in drinking water is an important analytical objective for both human health and environmental science. Here we report the use of solid phase extraction (SPE) in combination with a custom-made portable light-emitting diode (LED) spectrophotometer to achieve detection of chromate in the field at nanomolar levels. The measurement chemistry is based on a highly selective reaction between 1,5-diphenylcarbazide (DPC) and chromate under acidic conditions. The Cr-DPC complex formed in the reaction can be extracted on a commercial C18 SPE cartridge. Concentrated Cr-DPC is subsequently eluted with methanol and detected by spectrophotometry. Optimization of analytical conditions involved investigation of reagent compositions and concentrations, eluent type, flow rate (sample loading), sample volume, and stability of the SPE cartridge. Under optimized conditions, detection limits are on the order of 3 nM. Only 50 mL of sample is required for an analysis, and total analysis time is around 10 min. The targeted analytical range of 0-500 nM can be easily extended by changing the sample volume. Compared to previous SPE-based spectrophotometric methods, this analytical procedure offers the benefits of improved sensitivity, reduced sample consumption, shorter analysis time, greater operational convenience, and lower cost. Copyright © 2012 Elsevier B.V. All rights reserved.

  16. [Determination of soil exchangeable base cations by using atomic absorption spectrophotometer and extraction with ammonium acetate].

    Science.gov (United States)

    Zhang, Yu-ge; Xiao, Min; Dong, Yi-hua; Jiang, Yong

    2012-08-01

    A method to determine soil exchangeable calcium (Ca), magnesium (Mg), potassium (K), and sodium (Na) by using atomic absorption spectrophotometer (AAS) and extraction with ammonium acetate was developed. Results showed that the accuracy of exchangeable base cation data with AAS method fits well with the national standard referential soil data. The relative errors for parallel samples of exchangeable Ca and Mg with 66 pair samples ranged from 0.02%-3.14% and 0.06%-4.06%, and averaged to be 1.22% and 1.25%, respectively. The relative errors for exchangeable K and Na with AAS and flame photometer (FP) ranged from 0.06%-8.39% and 0.06-1.54, and averaged to be 3.72% and 0.56%, respectively. A case study showed that the determination method for exchangeable base cations by using AAS was proven to be reliable and trustable, which could reflect the real situation of soil cation exchange properties in farmlands.

  17. A double-beam rapid-scanning stopped-flow spectrophotometer.

    Science.gov (United States)

    Holloway, M R; White, H A

    1975-01-01

    A double-beam rapid-wavelength-scanning stopped-flow spectrophotometer system based on the Norcon model 501 spectrometer was construced, which enables u.v.-or visible absorbance spectra to be recorded at the rate of 800/s after the rapid mixing (within 3ms) of two reactant solutions. Each spectrum spans about 200nm in 1ms. It is possible to record difference spectra during reactions with half-lives less than 10ms involving absorbance changes of less than 0.1 absorbance unit. Analogue circuitry is used to produce spectra of absorbance against wavelength. Up to 32 such spectra can be recorded at pre-selected times during a reaction and stored in an 8Kx8-bit-word hard-wired data-capture system to be subsequently displaned individually or simultaneously. Time-courses at different wavelengths can also be displayed. By averaging up to 216 spectra it is possible to record spectra under conditions of low signal-to-noise ratios... Images Fig. 3. Fig. 9. PMID:172069

  18. Design of a novel spectrophotometer for water quality monitor based on holography concave grating and CCD

    Science.gov (United States)

    Ren, Zhong; Liu, Guodong; Zeng, Lvming; Huang, Zhen

    2012-01-01

    With the rapid development of the society and living standard, the water resources have been polluted more and more seriously, which is threatening the health of people and producing of the industry and agriculture. To protect the sustainable water resource, the monitoring of the water quality became an urgent task. There are some methods used to monitor the water quality, including the liquid chromatograph(LC), electrolysis method, electrochemical method, colorimetry method, atomic absorption spectrometric method, etc. But some drawbacks are existed in these methods. So, a fluorescence spectrophotometry method is adopted into this paper. And a novel water quality monitor(WQM) is designed. Meanwhile, in order to improve the spectral resolution and prevision, an improved spectrophotometer(SPM) based on holography concave (HC)grating is designed. In addition, the linear CCD with combined data acquisition (DAQ) card is used as the spectral detection system and virtual instrument(VI) technology based on LabVIEW is used to control the spectral acquisition and analysis. Experimental results show that the performances of the novel SPM for WQM are improved, its resolution can reach 2nm, the stray-light is less and the checking prevision of this WQM is higher than others. Therefore, the novel SPM for WQM has the potential value in the water quality monitoring and biochemical application.

  19. Improved retrieval of nitrogen dioxide (NO2 column densities by means of MKIV Brewer spectrophotometers

    Directory of Open Access Journals (Sweden)

    H. Diémoz

    2014-11-01

    Full Text Available A new algorithm to retrieve nitrogen dioxide (NO2 column densities using MKIV ("Mark IV" Brewer spectrophotometers is described. The method includes several improvements, such as a more recent spectroscopic data set, the reduction of measurement noise, interference by other atmospheric species and instrumental settings, and a better determination of the zenith sky air mass factor. The technique was tested during an ad hoc calibration campaign at the high-altitude site of Izaña (Tenerife, Spain and the results of the direct sun and zenith sky geometries were compared to those obtained by two reference instruments from the Network for the Detection of Atmospheric Composition Change (NDACC: a Fourier Transform Infrared Radiometer (FTIR and an advanced visible spectrograph (RASAS-II based on the differential optical absorption spectrometry (DOAS technique. To determine the extraterrestrial constant, an easily implementable extension of the standard Langley technique for very clean sites without tropospheric NO2 was developed which takes into account the daytime linear drift of stratospheric nitrogen dioxide due to photochemistry. The measurement uncertainty was thoroughly determined by using a Monte Carlo technique. Poisson noise and wavelength misalignments were found to be the most influential contributors to the overall uncertainty, and possible solutions are proposed for future improvements. The new algorithm is backward-compatible, thus allowing for the reprocessing of historical data sets.

  20. X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990

    Science.gov (United States)

    Hoover, Richard B. (Editor); Walker, Arthur B. C., Jr. (Editor)

    1991-01-01

    Topics discussed in this issue include the fabrication of multilayer X-ray/EUV coatings; the design, characterization, and test of multilayer X-ray/EUV coatings; multilayer X-ray/EUV monochromators and imaging microscopes; X-ray/EUV telescopes; the test and calibration performance of X-ray/EUV instruments; XUV/soft X-ray projection lithography; X-ray/EUV space observatories and missions; X-ray/EUV telescopes for solar research; X-ray/EUV polarimetry; X-ray/EUV spectrographs; and X-ray/EUV filters and gratings. Papers are presented on the deposition-controlled uniformity of multilayer mirrors, interfaces in Mo/Si multilayers, the design and analysis of an aspherical multilayer imaging X-ray microscope, recent developments in the production of thin X-ray reflecting foils, and the ultraprecise scanning technology. Consideration is also given to an active sun telescope array, the fabrication and performance at 1.33 nm of a 0.24-micron-period multilayer grating, a cylindrical proportional counter for X-ray polarimetry, and the design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission.

  1. Exploration of the Transition Region-Corona Interface With the Multi-Order Solar EUV Spectrograph Project

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose to observe the solar upper transition region and lower corona in Ne VII 46.5 nm with the Multi-Order Solar EUV Spectrograph (MOSES) rocket payload. The...

  2. Uncooled Radiation Hard Large Area SiC X-ray and EUV Detectors and 2D Arrays Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This project seeks to design, fabricate, characterize and commercialize large area, uncooled and radiative hard 4H-SiC EUV ? soft X-ray detectors capable of ultra...

  3. High Quality, Low-Scatter SiC Optics Suitable for Space-based UV & EUV Applications Project

    Data.gov (United States)

    National Aeronautics and Space Administration — SSG Precision Optronics proposes the development and demonstration of a new optical fabrication process for the production of EUV quality Silicon Carbide (SiC)...

  4. A solar type II radio burst from CME-coronal ray interaction: simultaneous radio and EUV imaging

    CERN Document Server

    Chen, Yao; Feng, Li; Feng, Shiwei; Kong, Xiangliang; Guo, Fan; Wang, Bing; Li, Gang

    2014-01-01

    Simultaneous radio and extreme ultraviolet (EUV)/white-light imaging data are examined for a solar type II radio burst occurring on 2010 March 18 to deduce its source location. Using a bow-shock model, we reconstruct the 3-dimensional EUV wave front (presumably the type-II emitting shock) based on the imaging data of the two STEREO spacecraft. It is then combined with the Nan\\c{c}ay radio imaging data to infer the 3-dimensional position of the type II source. It is found that the type II source coincides with the interface between the CME EUV wave front and a nearby coronal ray structure, providing evidence that the type II emission is physically related to the CME-ray interaction. This result, consistent with those of previous studies, is based on simultaneous radio and EUV imaging data for the first time.

  5. Students’ Reflections on Writing in ESP

    Directory of Open Access Journals (Sweden)

    Galina Kavaliauskienė

    2012-12-01

    Full Text Available Active participation of students in the self-evaluation of their learning and the development of reflective thinking are the key features of successful learning. This research is aimed at investigating influence of students’ self-assessment on writing in English for Specific Purposes (ESP. The study employed a survey on the usefulness of different written tasks and students‘ reflections on their benefits to language mastery. The assignments included various contributions to portfolios such as essays, summaries of professional texts, outlines of oral presentations, creative computer tasks as well as students‘ written self-assessment notes, i.e. their reflections on various classroom activities. The research involved the students who study Social Sciences at Mykolas Romeris University. The results demonstrated that self-assessment was beneficial to students’ linguistic development. The reflections reveal the attitudes to various assignments and judgments of their usefulness in learning. Reflective practice might help teachers develop ways of dealing with specific difficulties and improve the quality of teaching. Training learners to reflect on learning outcomes is beneficial from the perspective of lifelong learning.

  6. State-of-the-art EUV materials and processes for the 7nm node and beyond

    Science.gov (United States)

    Buitrago, Elizabeth; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Vockenhuber, Michaela; Mochi, Iacopo; Fallica, Roberto; Tasdemir, Zuhal; Ekinci, Yasin

    2017-03-01

    Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) being the most likely candidate to manufacture electronic devices for future technology nodes is to be introduced in high volume manufacturing (HVM) at the 7 nm logic node, at least at critical lithography levels. With this impending introduction, it is clear that excellent resist performance at ultra-high printing resolutions (below 20 nm line/space L/S) is ever more pressing. Nonetheless, EUVL has faced many technical challenges towards this paradigm shift to a new lithography wavelength platform. Since the inception of chemically amplified resists (CARs) they have been the base upon which state-of-the art photoresist technology has been developed from. Resist performance as measured in terms of printing resolution (R), line edge roughness (LER), sensitivity (D or exposure dose) and exposure latitude (EL) needs to be improved but there are well known trade-off relationships (LRS trade-off) among these parameters for CARs that hamper their simultaneous enhancement. Here, we present some of the most promising EUVL materials tested by EUV interference lithography (EUV-IL) with the aim of resolving features down to 11 nm half-pitch (HP), while focusing on resist performance at 16 and 13 nm HP as needed for the 7 and 5 nm node, respectively. EUV-IL has enabled the characterization and development of new resist materials before commercial EUV exposure tools become available and is therefore a powerful research and development tool. With EUV-IL, highresolution periodic images can be printed by the interference of two or more spatially coherent beams through a transmission-diffraction grating mask. For this reason, our experiments have been performed by EUV-IL at Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI). Having the opportunity to test hundreds of EUVL materials from vendors and research partners from all over the world, PSI is able to give a global update on some of the

  7. Debris and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance.

    Energy Technology Data Exchange (ETDEWEB)

    Allain, J. P.; Nieto, M.; Hendricks, M.; Harilal, S. S.; Hassanein, A.; Mathematics and Computer Science

    2007-01-01

    Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources to debris (fast ions, neutrals, off-band radiation, droplets) remains one of the highest critical issues of source component lifetime and commercial feasibility of nanolithography at 13.5-nm. Typical radiators used at 13.5-nm include Xe and Sn. Fast particles emerging from the pinch region of the lamp are known to induce serious damage to nearby collector mirrors. Candidate collector configurations include either multi-layer mirrors (MLM) or single-layer mirrors (SLM) used at grazing incidence. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance at 13.5-nm under fast Sn or Xe exposure. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity (15-degree incidence and 13.5-nm) variation during fast particle exposure. Intense EUV light and off-band radiation is also known to contribute to mirror damage. For example offband radiation can couple to the mirror and induce heating affecting the mirror's surface properties. In addition, intense EUV light can partially photo-ionize background gas (e.g., Ar or He) used for mitigation in the source device. This can lead to local weakly ionized plasma creating a sheath and accelerating charged gas particles to the mirror surface and inducing sputtering. In this paper we study several aspects of debris and radiation-induced damage to candidate EUVL source collector optics materials. The first study concerns the use of IMD simulations to study the effect of surface roughness on EUV reflectivity. The second studies the effect of fast particles on MLM reflectivity at 13.5-nm. And lastly the third studies the effect of multiple energetic sources with thermal Sn on 13.5-nm reflectivity. These studies focus on conditions that simulate the EUVL source environment in a controlled way.

  8. Debris- and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance

    Science.gov (United States)

    Allain, J. P.; Nieto, M.; Hendricks, M.; Harilal, S. S.; Hassanein, A.

    2007-05-01

    Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources to debris (fast ions, neutrals, off-band radiation, droplets) remains one of the highest critical issues of source component lifetime and commercial feasibility of nanolithography at 13.5-nm. Typical radiators used at 13.5-nm include Xe and Sn. Fast particles emerging from the pinch region of the lamp are known to induce serious damage to nearby collector mirrors. Candidate collector configurations include either multi-layer mirrors (MLM) or single-layer mirrors (SLM) used at grazing incidence. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance at 13.5-nm under fast Sn or Xe exposure. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity (15-degree incidence and 13.5-nm) variation during fast particle exposure. Intense EUV light and off-band radiation is also known to contribute to mirror damage. For example offband radiation can couple to the mirror and induce heating affecting the mirror's surface properties. In addition, intense EUV light can partially photo-ionize background gas (e.g., Ar or He) used for mitigation in the source device. This can lead to local weakly ionized plasma creating a sheath and accelerating charged gas particles to the mirror surface and inducing sputtering. In this paper we study several aspects of debris and radiation-induced damage to candidate EUVL source collector optics materials. The first study concerns the use of IMD simulations to study the effect of surface roughness on EUV reflectivity. The second studies the effect of fast particles on MLM reflectivity at 13.5-nm. And lastly the third studies the effect of multiple energetic sources with thermal Sn on 13.5-nm reflectivity. These studies focus on conditions that simulate the EUVL source environment in a controlled way.

  9. Comparing predictive abilities of three visible-near infrared spectrophotometers for soil organic carbon and clay determination

    DEFF Research Database (Denmark)

    Knadel, Maria; Stenberg, Bo; Deng, Fan

    2013-01-01

    carbon (SOC) and clay calibrations for 194 Danish top soils. Scanning procedures for the three spectrophotometers where done according to uniform laboratory protocols. SOC and clay calibrations were performed using PLS regression. One third of the data was used as an independent test set. A range...... of spectral preprocessing methods was applied in search for model improvement. Validation for SOC content using an independent data set derived from all three spectrophotometers provided values of RMSEP between 0.45 and 0.52 %, R2=0.44-0.58 and RPD=1.3-1.5. Clay content was predicted with a higher precision...... for SOC and clay predictions. The application of different spectral preprocessing procedures did not generate important improvements of the calibration models either. The results from this study showed that as long as strict laboratory scanning protocols were followed no significant differences...

  10. Comparison of accuracies of an intraoral spectrophotometer and conventional visual method for shade matching using two shade guide systems

    Directory of Open Access Journals (Sweden)

    Vidhya Parameswaran

    2016-01-01

    Conclusion: This in vitro study clearly delineates the advantages and limitations of both methods. There were significant differences between the methods with the visual method producing more accurate results than the spectrophotometric method. The spectrophotometer showed far better interrater agreement scores irrespective of the shade guide used. Even though visual shade matching is subjective, it is not inferior and should not be underrated. Judicious combination of both techniques is imperative to attain a successful and esthetic outcome.

  11. Roughened glass slides and a spectrophotometer for the detection of the wavelength-dependent refractive index of transparent liquids.

    Science.gov (United States)

    Niskanen, Ilpo; Räty, Jukka; Myllylä, Risto; Sutinen, Veijo; Matsuda, Kiyofumi; Homma, Kazuhiro; Silfsten, Pertti; Peiponen, Kai-Erik

    2012-07-01

    We describe a method to determine the wavelength-dependent refractive index of liquids by measurement of light transmittance with a spectrophotometer. The method is based on using roughened glass slides with different a priori known refractive indices and immersing the slides into the transparent liquid with unknown refractive index. Using the dispersion data on the glass material it is possible to find the index match between the liquid and the glass slide, and hence the refractive index of the liquid.

  12. Non-destructive assessment of grapevine water status in the field using a portable NIR spectrophotometer.

    Science.gov (United States)

    Tardaguila, Javier; Fernández-Novales, Juan; Gutiérrez, Salvador; Diago, Maria Paz

    2017-08-01

    Until now, the majority of methods employed to assess grapevine water status have been destructive, time-intensive, costly and provide information of a limited number of samples, thus the ability of revealing within-field water status variability is reduced. The goal of this work was to evaluate the capability of non-invasive, portable near infrared (NIR) spectroscopy acquired in the field, to assess the grapevine water status in diverse varieties, grown under different environmental conditions, in a fast and reliable way. The research was conducted 2 weeks before harvest in 2012, in two commercial vineyards, planted with eight different varieties. Spectral measurements were acquired in the field on the adaxial and abaxial sides of 160 individual leaves (20 leaves per variety) using a commercially available handheld spectrophotometer (1600-2400 nm). Principal component analysis (PCA) and modified partial least squares (MPLS) were used to interpret the spectra and to develop reliable prediction models for stem water potential (Ψs ) (cross-validation correlation coefficient (rcv ) ranged from 0.77 to 0.93, and standard error of cross validation (SECV) ranged from 0.10 to 0.23), and leaf relative water content (RWC) (rcv ranged from 0.66 to 0.81, and SECV between 1.93 and 3.20). The performance differences between models built from abaxial and adaxial-acquired spectra is also discussed. The capability of non-invasive NIR spectroscopy to reliably assess the grapevine water status under field conditions was proved. This technique can be a suitable and promising tool to appraise within-field variability of plant water status, helpful to define optimised irrigation strategies in the wine industry. © 2017 Society of Chemical Industry. © 2017 Society of Chemical Industry.

  13. Comparison of Ozone Retrievals from the Pandora Spectrometer System and Dobson Spectrophotometer in Boulder, Colorado

    Science.gov (United States)

    Herman, J.; Evans, R.; Cede, A.; Abuhassan, N.; Petropavlovskikh, I.; McConville, G.

    2015-01-01

    A comparison of retrieved total column ozone (TCO) amounts between the Pandora #34 spectrometer system and the Dobson #061 spectrophotometer from direct-sun observations was performed on the roof of the Boulder, Colorado, NOAA building. This paper, part of an ongoing study, covers a 1-year period starting on 17 December 2013. Both the standard Dobson and Pandora TCO retrievals required a correction, TCO(sub corr) = TCO (1 + C(T)), using a monthly varying effective ozone temperature, T(sub E), derived from a temperature and ozone profile climatology. The correction is used to remove a seasonal difference caused by using a fixed temperature in each retrieval algorithm. The respective corrections C(T(sub E)) are C(sub Pandora) = 0.00333(T(sub E) - 225) and C(sub Dobson) = -0.0013(T(sub E) - 226.7) per degree K. After the applied corrections removed most of the seasonal retrieval dependence on ozone temperature, TCO agreement between the instruments was within 1% for clear-sky conditions. For clear-sky observations, both co-located instruments tracked the day-to-day variation in total column ozone amounts with a correlation of r(exp 2) = 0.97 and an average offset of 1.1 +/- 5.8 DU. In addition, the Pandora TCO data showed 0.3% annual average agreement with satellite overpass data from AURA/OMI (Ozone Monitoring Instrument) and 1% annual average offset with Suomi-NPP/OMPS (Suomi National Polar-orbiting Partnership, the nadir viewing portion of the Ozone Mapper Profiler Suite).

  14. Comparison between Brewer spectrometer, M 124 filter ozonometer and Dobson spectrophotometer

    Science.gov (United States)

    Feister, U.

    1994-01-01

    Concurrent measurements were taken using the Brewer spectrometer no. 30, the filter ozonometer M 124 no. 200 and the Dobson spectrophotometer no. 71 from September 1987 to December 1988 at Potsdam. The performance of the instrument types and the compatibility of ozone data was checked under the conditions of a field measuring station. Total ozone values derived from Dobson AD direct sun measurements were considered as standard. The Dobson instrument had been calibrated at intercomparisons with the World Standard Dobson instrument no. 83 (Boulder) and with the Regional Standard instrument no. 64 (Potsdam), while the Brewer instrument was calibrated several times with the Travelling Standard Brewer no. 17 (Canada). The differences between individual Brewer DS (direct sun) ozone data and Dobson ADDS are within plus or minus 3 percent with half of all differences within plus or minus 1 percent. Less than 0.7 percent of the systematic difference can be due to atmospheric SO2. Due to inadequate regression coefficients Brewer ZB (zenith blue) ozone measurements are by (3...4) percent higher than Dobson ADDS ozone values. M124 DS ozone data are systematically by (1...2) percent higher than Dobson ADDS ozone with 50 percent of the differences within plus or minus 4 percent, but with extreme differences up to plus or minus (20...25) percent. M124 ZB ozone values are by (3...5) percent higher than Dobson ADDS with all the differences within plus or minus 10 percent, i.e. the scatter of differences is smaller for ZB than for M 124 DS measurements, Results for differences in the daily mean ozone values are also addressed. The differences include the uncertainties in the ozone values derived from both types of measurements. They provide an indication of the uncertainty in ozone data and the comparability of ozone values derived from different types of instruments.

  15. Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation

    Science.gov (United States)

    Kim, In-Seon; Kim, Guk-Jin; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

    2017-03-01

    EUV lithography is one of the promising technologies for 1X nm patterning. EUV lithography has high resolution capability because of short wavelength of source but it has some particular patterning problems which are not appeared a t optical lithography. Owing to reflective optics, EUV light incidents obliquely in mask and oblique incidence of EUV lithography leads shadow effect and arc-shaped exposure slit. The study of these particular optical problems are required for optical proximity correction (OPC). Arc-shaped exposure slit leads azimuthal angle variation, incident angle variation , and variation of shadow width. With these variations along exposure slit, patterning result is varied along the exposure slit. With understanding of these particular optical problems, lots of EUV OPC studies have been presented with 0.33 conventional NA system. However, suggested anamorphic high NA system has not only elliptical shaped mask NA and also different angle distribution. The incident angle variation as a function of azimuthal angle is different between isomorphic and anamorphic NA systems. In case of anamorphic NA system, incident angle distribution is decreased on horizontal direction but it is larger on vertical direction compared with case of isomorphic NA system. These differences make different arc-shaped slit effect. CD variation as a function of azimuthal angle is different between isomorphic and a namorphic NA systems. The study of CD variation along the exposure slit is very helpful for OPC in EUV lithography.

  16. Isabel Allende: "La casa de los espíritos"

    OpenAIRE

    Scheerer, Thomas M. (Prof.)

    1992-01-01

    Isabel Allende: "La casa de los espíritos" / Monika M. u. Thomas M. Scheerer. - In: Der hispanoamerikanische Roman / hrsg. von Volker Roloff ... - Darmstadt : Wiss. Buchges. - Bd. 2. (1992). - S. 238-248

  17. Developing an ESP Curriculum : English for Medical Clinics

    OpenAIRE

    Mohammad Umar, FAROOQ

    2011-01-01

    The article is an attempt to (i) develop an ESP curriculum specifically related to medical secretary English, (ii) implement in a classroom, and (iii) examine whether it would be helpful for learners. In this regard, employing a theoretical model of ESP materials' design, first a need analysis is conducted to decide the contents of a syllabus. In view of the syllabus, materials are designed following the instructions given in the model. Lastly, the effectiveness of the curriculum is argued ba...

  18. Overcoming EUV mask blank defects: what we can, and what we should

    Science.gov (United States)

    Jonckheere, Rik

    2017-07-01

    This invited paper reviews progress over the past ten years of contributed effort to the understanding and the mitigation of multilayer defects on the EUV mask blank. These defects are an EUV-specific type of mask defects. Whereas the only true solution is to totally avoid the presence of such ML-defects during blank manufacturing, some level of capability of printability mitigation has been demonstrated, both by absorber compensation repair and by pattern shift. In both cases, it is essential that one can build on a full-proof blank inspection capability, that detects all printable blank defects, at a very low false detection rate, such as by using actinic blank inspection. This capability, together with providing accurate defect location information, establishes an essential prerequisite for their mitigation or avoidance. On the latter, the proposal is made to extend pattern shift to intentional pattern deformation.

  19. Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists

    KAUST Repository

    Jiang, Jing

    2015-03-19

    Ligand stabilized metal oxide nanoparticle resists are promising candidates for EUV lithography due to their high sensitivity for high-resolution patterning and high etching resistance. As ligand exchange is responsible for the patterning mechanism, we systematically studied the influence of ligand structures of metal oxide EUV nanoparticles on their sensitivity and dissolution behavior. ZrO2 nanoparticles were protected with various aromatic ligands with electron withdrawing and electron donating groups. These nanoparticles have lower sensitivity compared to those with aliphatic ligands suggesting the structures of these ligands is more important than their pka on resist sensitivity. The influence of ligand structure was further studied by comparing the nanoparticles’ solubility for a single type ligand to mixtures of ligands. The mixture of nanoparticles showed improved pattern quality. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

  20. Deposition and sputtering yields on EUV collector mirror from Laser Plasma Extreme Ultraviolet Sources

    Energy Technology Data Exchange (ETDEWEB)

    Wu Tao [Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Rao Zhiming [Depart of Computer Science, Jiangxi University of Traditional Chinese Medicine, Nanchang 330004, Jiangxi (China); Wang Shifang, E-mail: flatime@163.com [School of Physics and Electric Information, Hubei University of Education 1 Nanhuan Road, Wuhan East High-Tech. Zone, Wuhan 430205, Hubei (China)

    2011-02-01

    Based on the self-similar solution of gas dynamic equations, spherical expansion of the highly ionized plasma with limited mass into a vacuum is investigated for the droplet target laser-produced plasma extreme ultraviolet (LPP-EUV) sources. Using partially numerical and partially analytical technology, the velocity, the temperature and the density profiles in the plume versus ionization degree, adiabatic index and initial conditions are presented. Furthermore, the spatial thickness variations of the deposited substrate witness and ion sputtering yields for Ru, Mo, and Si under Sn ion bombardment are theoretically calculated, which can be useful to enable LPP-EUV sources suppliers to estimate collector lifetime and improve debris mitigation systems.

  1. Quantitative Chemically-Specific Coherent Diffractive Imaging of Buried Interfaces using a Tabletop EUV Nanoscope

    CERN Document Server

    Shanblatt, Elisabeth R; Gardner, Dennis F; Mancini, Giulia F; Karl, Robert M; Tanksalvala, Michael D; Bevis, Charles S; Vartanian, Victor H; Kapteyn, Henry C; Adams, Daniel E; Murnane, Margaret M

    2016-01-01

    Characterizing buried layers and interfaces is critical for a host of applications in nanoscience and nano-manufacturing. Here we demonstrate non-invasive, non-destructive imaging of buried interfaces using a tabletop, extreme ultraviolet (EUV), coherent diffractive imaging (CDI) nanoscope. Copper nanostructures inlaid in SiO2 are coated with 100 nm of aluminum, which is opaque to visible light and thick enough that neither optical microscopy nor atomic force microscopy can image the buried interfaces. Short wavelength (29 nm) high harmonic light can penetrate the aluminum layer, yielding high-contrast images of the buried structures. Moreover, differences in the absolute reflectivity of the interfaces before and after coating reveal the formation of interstitial diffusion and oxidation layers at the Al-Cu and Al-SiO2 boundaries. Finally, we show that EUV CDI provides a unique capability for quantitative, chemically-specific imaging of buried structures, and the material evolution that occurs at these buried ...

  2. EUV stimulated emission from MgO pumped by FEL pulses

    Directory of Open Access Journals (Sweden)

    Philippe Jonnard

    2017-09-01

    Full Text Available Stimulated emission is a fundamental process in nature that deserves to be investigated and understood in the extreme ultra-violet (EUV and x-ray regimes. Today, this is definitely possible through high energy density free electron laser (FEL beams. In this context, we give evidence for soft-x-ray stimulated emission from a magnesium oxide solid target pumped by EUV FEL pulses formed in the regime of travelling-wave amplified spontaneous emission in backward geometry. Our results combine two effects separately reported in previous works: emission in a privileged direction and existence of a material-dependent threshold for the stimulated emission. We develop a novel theoretical framework, based on coupled rate and transport equations taking into account the solid-density plasma state of the target. Our model accounts for both observed mechanisms that are the privileged direction for the stimulated emission of the Mg L2,3 characteristic emission and the pumping threshold.

  3. EUV actinic defect inspection and defect printability at the sub-32 nm half pitch

    Energy Technology Data Exchange (ETDEWEB)

    Huh, Sungmin; Kearney, Patrick; Wurm, Stefan; Goodwin, Frank; Han, Hakseung; Goldberg, Kenneth; Mochi, Iacopp; Gullikson, Eric M.

    2009-08-01

    Extreme ultraviolet (EUV) mask blanks with embedded phase defects were inspected with a reticle actinic inspection tool (AIT) and the Lasertec M7360. The Lasertec M7360, operated at SEMA TECH's Mask Blank Development Center (MBDC) in Albany, NY, has a sensitivity to multilayer defects down to 40-45 nm, which is not likely sufficient for mask blank development below the 32 nm half-pitch node. Phase defect printability was simulated to calculate the required defect sensitivity for a next generation blank inspection tool to support reticle development for the sub-32 nm half-pitch technology node. Defect mitigation technology is proposed to take advantage of mask blanks with some defects. This technology will reduce the cost of ownership of EUV mask blanks. This paper will also discuss the kind of infrastructure that will be required for the development and mass production stages.

  4. Embedded top-coat for reducing the effect out of band radiation in EUV lithography

    Science.gov (United States)

    Du, Ke; Siauw, Meiliana; Valade, David; Jasieniak, Marek; Voelcker, Nico; Trefonas, Peter; Thackeray, Jim; Blakey, Idriss; Whittaker, Andrew

    2017-03-01

    Out of band (OOB) radiation from the EUV source has significant implications for the performance of EUVL photoresists. Here we introduce a surface-active polymer additive, capable of partitioning to the top of the resist film during casting and annealing, to protect the underlying photoresist from OOB radiation. Copolymers were prepared using reversible addition-fragmentation chain transfer (RAFT) polymerization, and rendered surface active by chain extension with a block of fluoro-monomer. Films were prepared from the EUV resist with added surface-active Embedded Barrier Layer (EBL), and characterized using measurements of contact angles and spectroscopic ellipsometry. Finally, the lithographic performance of the resist containing the EBL was evaluated using Electron Beam Lithography exposure

  5. Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications

    Energy Technology Data Exchange (ETDEWEB)

    Hu, M.H.; Le Guen, K.; Andre, J.M.; Jonnard, P. [UPMC Univ Paris 06, CNRS UMR 7614, Laboratoire Chimie Physique - Matiere Rayonnement, Paris (France); Zhou, S.K.; Li, H.C.; Zhu, J.T.; Wang, Z.S. [Tongji University, Institute of Precision Optical Engineering, Department of Physics, Shanghai (China); Meny, C. [CNRS UMR 7504, Institut de Physique et Chimie des Materiaux de Strasbourg (France); Mahne, N.; Giglia, A. [CNR-IOM Laboratorio TASC, Basovizza, Trieste (Italy); Nannarone, S. [CNR-IOM Laboratorio TASC, Basovizza, Trieste (Italy); Universita di Modenae R.E., Dipartimento Ingegneria Materiali, Modena (Italy); Esteve, I. [Univ. Paris 06 et 07, CNRS UMR 7590, Institut de Mineralogie et de Physique des Milieux Condenses, Paris (France); Walls, M. [Univ. Paris Sud, Laboratoire de Physiques des Solides, CNRS UMR 8502, Orsay (France)

    2012-03-15

    We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400 {sup circle} C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show a good quality of the multilayer structure. The measurements of the EUV reflectivity around 25 nm ({proportional_to}49 eV) indicate that the reflectivity decreases when the annealing temperature increases above 300 {sup circle} C. X-ray emission spectroscopy is performed to determine the chemical state of the Mg atoms within the Mg/Co multilayer. Nuclear magnetic resonance used to determine the chemical state of the Co atoms and scanning electron microscopy images of cross sections of the Mg/Co multilayers reveal changes in the morphology of the stack from an annealing temperature of 305 {sup circle} C. This explains the observed reflectivity loss. (orig.)

  6. Metaphor in the ESP engineering context

    Directory of Open Access Journals (Sweden)

    Ana Roldán-Riejos

    2013-04-01

    Full Text Available The explicit use of metaphor in the EFL classroom has been documented to enhance the communicative skills of learners (Cameron & Low, 1999; Cortazzi & Jin, 1999; Low, 1999; Littlemore & Low, 2006. ESP learners with a technical background, however, are not usually trained on the presence of metaphor in their knowledge field, or on its use. The aim of this paper is to analyze the unprompted use of metaphor in the verbal responses given by a group of Spanish civil engineering undergraduates when depicting visuals related to their area of expertise. The responses of the students were obtained from a questionnaire completed in the classroom which was later crosschecked with the answers given by a group of professional civil engineers. This was done to compare the occurrence of metaphor as a descriptive verbalizer in the academic and the professional contexts. The results confirm the use of general metaphor in both groups, and the use of field-specific metaphor particularly in the professional engineers (in order to avoid confusion with the engineer students group, which appears to suggest the evolving character of metaphor in the civil engineering discourse community. We conclude by highlighting the dynamicity of metaphor in the civil engineering context. From a pedagogic viewpoint, it would be advisable to concentrate on metaphor as a learning feature by considering three main dimensions: conceptual, linguistic and visual. This could be carried out by offering students corpora-driven examples of metaphor visibility in the different civil engineering genres, addressing non-verbal elements, such as sketches, drawings, designs and pictures where metaphor may be used. The theoretical framework for this study draws from conceptual metaphor theory and conceptual integration theory combined with a multimodal approach to metaphor (Fauconnier & Turner, 2002; Deignan, 2005; Steen, 2007; Fauconnier & Turner, 2008, Forceville, 2010; Kress, 2010.

  7. Information Technology Students’ Language Needs for their ESP Course

    Directory of Open Access Journals (Sweden)

    Parisa Balaei

    2018-03-01

    Full Text Available The purpose of this study was to find the needs of Iranian undergraduate Information Technology (IT engineering students for their ESP course. To this end, a needs analysis questionnaire was administered to 30 undergraduate IT students to elicit information about their needs in English language at Islamic Azad University, Tabriz Branch. The results of data analysis revealed that among four skills reading was the highly needed skill followed by writing. It was also found that a majority of participants were dissatisfied with the current ESP courses for undergraduate students. This, in fact, indicated that ESP curricula have not yet been successfully developed in satisfying the students’ professional needs in target situations. Findings point to the fact that ESP and its teaching in Iran has to undergo serious rethinking not only in the content of the course but also the whole process of teaching the language. The findings can help course designers to both put much more credit for ESP courses, and consider appropriate and suitable materials which can give useful information to the students. It can also help ESP teachers to meet the language needs of their students.

  8. Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

    KAUST Repository

    Chakrabarty, Souvik

    2013-04-01

    DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

  9. Robust design of broadband EUV multilayer beam splitters based on particle swarm optimization

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Hui, E-mail: jianghui@sinap.ac.cn [Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Zhangheng Road 239, Pudong District, Shanghai 201204 (China); King' s College London, Department of Physics, Strand, London WC2R 2LS (United Kingdom); Michette, Alan G. [King' s College London, Department of Physics, Strand, London WC2R 2LS (United Kingdom)

    2013-03-01

    A robust design idea for broadband EUV multilayer beam splitters is introduced that achieves the aim of decreasing the influence of layer thickness errors on optical performances. Such beam splitters can be used in interferometry to determine the quality of EUVL masks by comparing with a reference multilayer. In the optimization, particle swarm techniques were used for the first time in such designs. Compared to conventional genetic algorithms, particle swarm optimization has stronger ergodicity, simpler processing and faster convergence.

  10. Stellar and Laboratory XUV/EUV Line Ratios in Fe XVIII and Fe XIX

    Science.gov (United States)

    Träbert, Elmar; Beiersdorfer, P.; Clementson, J.

    2011-09-01

    A so-called XUV excess has been suspected with the relative fluxes of Fe XVIII and Fe XIX lines in XUV and EUV spectra of the star Capella as observed by the Chandra spacecraft [1] when comparing the observations with simulations of stellar spectra based on APEC or FAC. We have addressed this problem by laboratory studies using the Livermore electron beam ion trap (EBIT). Our understanding of the EBIT spectrum is founded on work by Brown et al. [2]. The electron density of the electron beam in an EBIT is compatible to the density in energetic stellar flares. In our experiments, the relative detection efficiencies of two flat-field grating spectrographs operating in the EUV (near 100 Å) and XUV (near 16 Å) ranges have been determined using the calculated branching ratio of 1-3 and 2-3 transition in the H-like spectrum O VIII. FAC calculations assuming several electron beam energies and electron densities serve to correct the EBIT observations for the Maxwellian excitation in a natural plasma. In the EUV, the line intensity pattern predicted by FAC agrees reasonably well with the laboratory and Capella observations. In the XUV wavelength range, agreement of laboratory and astrophysical line intensities is patchy. The spectral simulation results from FAC are much closer to stellar and laboratory observation than those obtained by APEC. Instead of claiming an XUV excess, the XUV/EUV line intensities can be explained by a somewhat higher temperature of Capella than the previously assumed T=6 MK. This work was performed under the auspices of the USDoE by LLNL under Contract DE-AC52-07NA27344 and was supported by the NASA under work order NNH07AF81I issued by the APRA Program. E.T. acknowledges support by DFG Germany. 1. P. Desai et al., ApJ 625, L59 (2005). 2. G. V. Brown et al., ApJS 140, 589 (2002).

  11. Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure

    Science.gov (United States)

    Pollentier, Ivan; Vesters, Yannick; Jiang, Jing; Vanelderen, Pieter; de Simone, Danilo

    2017-10-01

    The interaction of 91.6eV EUV photons with photoresist is very different to that of optical lithography at DUV wavelength. The latter is understood quite well and it is known that photons interact with the resist in a molecular way through the photoacid generator (PAG) of the chemically amplified resist (CAR). In EUV however, the high energy photons interact with the matter on atomic scale, resulting in the generation of secondary electrons. It is believed that these secondary electrons in their turn are responsible in chemical modification and lead to switching reactions that enable resist local dissolution. However, details of the interaction are still unclear, e.g. which reaction an electron with a given energy can initiate. In this work we have introduced a method to measure the chemical interaction of the secondary electrons with the EUV resist. The method is based on electron gun exposures of low energy electrons (range 1eV to 80eV) in the photoresist. The chemical interaction is then measured by Residual Gas Analysis (RGA), which can analyze out of the outgassing which and how much reaction products are generated. In this way a `chemical yield' can be quantified as function of electron energy. This method has been successfully applied to understand the interaction of secondary electrons on the traditional CAR materials. The understanding was facilitated by testing different compositions of an advanced EUV CAR, where resp. polymer only, polymer+PAG, and polymer+PAG+quencher are tested with the electron gun. It was found that low energy electrons down to 3-4eV can activate PAG dissociation, which can lead to polymer deprotection. However it was observed too that energy electrons of 12eV and higher can do direct deprotection even in absence of the PAG. In addition, testing suggests that electrons can generate also other chemical changes on the polymer chain that could lead to cross-linking.

  12. Laser-plasma SXR/EUV sources: adjustment of radiation parameters for specific applications

    Science.gov (United States)

    Bartnik, A.; Fiedorowicz, H.; Fok, T.; Jarocki, R.; Kostecki, J.; Szczurek, A.; Szczurek, M.; Wachulak, P.; Wegrzyński, Ł.

    2014-12-01

    In this work soft X-ray (SXR) and extreme ultraviolet (EUV) laser-produced plasma (LPP) sources employing Nd:YAG laser systems of different parameters are presented. First of them is a 10-Hz EUV source, based on a double-stream gaspuff target, irradiated with the 3-ns/0.8J laser pulse. In the second one a 10 ns/10 J/10 Hz laser system is employed and the third one utilizes the laser system with the pulse shorten to approximately 1 ns. Using various gases in the gas puff targets it is possible to obtain intense radiation in different wavelength ranges. This way intense continuous radiation in a wide spectral range as well as quasi-monochromatic radiation was produced. To obtain high EUV or SXR fluence the radiation was focused using three types of grazing incidence collectors and a multilayer Mo/Si collector. First of them is a multfoil gold plated collector consisted of two orthogonal stacks of ellipsoidal mirrors forming a double-focusing device. The second one is the ellipsoidal collector being part of the axisymmetrical ellipsoidal surface. Third of the collectors is composed of two aligned axisymmetrical paraboloidal mirrors optimized for focusing of SXR radiation. The last collector is an off-axis ellipsoidal multilayer Mo/Si mirror allowing for efficient focusing of the radiation in the spectral region centered at λ = 13.5 ± 0.5 nm. In this paper spectra of unaltered EUV or SXR radiation produced in different LPP source configurations together with spectra and fluence values of focused radiation are presented. Specific configurations of the sources were assigned to various applications.

  13. Photoresist shrinkage effects in 16 nm node extreme ultraviolet (EUV) photoresist targets

    Science.gov (United States)

    Bunday, Benjamin; Montgomery, Cecilia; Montgomery, Warren; Cepler, Aron

    2013-04-01

    Photoresist shrinkage (i.e., line slimming) is an important systematic uncertainty source in critical dimension-scanning electron microscope (CD-SEM) metrology of lithographic features [1] [2] [3] [4] [5]. It influences both the precision and the accuracy of CD-SEM measurements, while locally damaging the sample. Minimization or elimination of shrinkage is desirable, yet elusive. This error source will be a factor in CD-SEM metrology on polymer materials in EUV lithography. Recent work has demonstrated improved understanding of the trends in the shrinkage response depending on electron beam and target parameters in static measurements [2] [3] [4] [5] [6]. Some research has highlighted a second mode of shrinkage that is apparent over time and progresses as a function of time between consecutive measurements, a form of "dynamic shrinkage" that appears to be activated by electron beam, in which the activated feature perpetually and logarithmically shrinks [7] [8]. Another work has demonstrated that as pitches continue to get smaller with resulting reductions in spaces between lines, charging may emerge as an additional, competing, unpredictable error source for CD-SEM metrology on dense photoresist features, an issue that is predicted to become more common as these spaces become more confined [9]. In this work, we explore the static shrinkage behaviors of various EUV photoresists into the 16 nm half-pitch node, with samples generated using the advanced EUV lithography capable of generating such tight pitches [10]. Dynamic shrinkage behavior was explored on these materials last year [15]. The static shrinkage behaviors will be validated to show compliance with the SEMATECH shrinkage model [5] [6] on small EUV resist features. Using the results of the model fits, a simulation study will predict the shrinkage trends at future nodes. Further studies will confirm whether or not charging phenomena are observable, and the beginning of a charging simulation study will be

  14. Photon flux requirements for EUV reticle imaging microscopy in the 22 and 16 nm nodes

    Energy Technology Data Exchange (ETDEWEB)

    Wintz, D.; Goldberg, K. A.; Mochi, I.; Huh, S.

    2010-03-12

    EUV-wavelength actinic microscopy yields detailed information about EUV mask patterns, architectures, defects, and the performance of defect repair strategies, without the complications of photoresist imaging. The measured aerial image intensity profiles provide valuable feedback to improve mask and lithography system modeling methods. In order to understand the photon-flux-dependent pattern measurement limits of EUV mask-imaging microscopy, we have investigated the effects of shot noise on aerial image linewidth measurements for lines in the 22 and 16-nm generations. Using a simple model of image formation near the resolution limit, we probe the influence of photon shot noise on the measured, apparent line roughness. With this methodology, we arrive at general flux density requirements independent of the specific EUV microscope configurations. Analytical and statistical analysis of aerial image simulations in the 22 and 16-nm generations reveal the trade-offs between photon energy density (controllable with exposure time), effective pixel dimension on the CCO (controlled by the microscope's magnification ratio), and image log slope (ILS). We find that shot-noise-induced linewidth roughness (LWR) varies imersely with the square root of the photon energy density, and is proportional to the imaging magnification ratio. While high magnification is necessary for adequate spatial resolution, for a given flux density, higher magnification ratios have diminishing benefits. With practical imaging parameters, we find that in order to achieve an LWR (3{sigma}) value of 5% of linewidth for dense, 88-nm mask features with 80% aerial image contrast and 13.5-nm effective pixel width (1000x magnification ratio), a peak photon flux of approximately 1400 photons per pixel per exposure is required.

  15. Modeling and optimization of mass-limited targets for EUV lithography

    Science.gov (United States)

    Sizyuk, T.; Hassanein, A.

    2012-03-01

    Current challenges in the development of efficient laser produced plasma (LPP) sources for EUV lithography are increasing EUV power at IF and maximizing lifetime and therefore, reducing cost of devices. Mass-limited targets such as small tin droplets are considered among the best choices for cleaner operation of the optical system because of lower mass of atomic debris produced by the laser beam. The small diameter of droplets, however, decreases the conversion efficiency (CE) of EUV photons emission, especially in the case of CO2 laser, where laser wavelength has high reflectivity from the tin surface. We investigated ways of improving CE in mass-limited targets. We considered in our modeling various possible target phases and lasers configurations: from solid/liquid droplets subjected to laser beam energy with different intensities and laser wavelength to dual-beam lasers, i.e., a pre-pulse followed by a main pulse with adjusted delay time in between. We studied the dependence of vapor expansion rate, which can be produced as a result of droplet heating by pre-pulse laser energy, on target configuration, size, and laser beam parameters. As consequence, we studied the influence of these conditions and parameters on the CE and debris mass accumulation. For better understanding and more accurate modeling of all physical processes occurred during various phases of laser beam/target interactions, plasma plume formation and evolution, EUV photons emission and collection, we have implemented in our HEIGHTS package state-of-the art models and methods, verified, and benchmarked against laboratory experiments in our CMUXE center as well as various worldwide experimental results.

  16. Coefficient of thermal expansion (CTE) in EUV lithography: LER and adhesion improvement

    Science.gov (United States)

    Higgins, Craig; Settens, Charles; Wolfe, Patricia; Petrillo, Karen; Auger, Robert; Matyi, Richard; Brainard, Robert

    2011-04-01

    Spin-on underlayers are currently being employed by the lithographic industry to improve the imaging performance of EUV resists. In this work, multiple examples have shown improved line-edge roughness (LER) of an open-source resist using new open-source underlayers in comparison to a primed silicon substrate. Additionally, several experiments demonstrate better resist adhesion on underlayers that have lower coefficients of thermal expansion (CTE). Both organic and inorganic underlayers provide better resist LER when their CTE is lower.

  17. The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials.

    Science.gov (United States)

    Closser, Kristina D; Ogletree, D Frank; Naulleau, Patrick; Prendergast, David

    2017-04-28

    In order to increase computation power and efficiency, the semiconductor industry continually strives to reduce the size of features written using lithographic techniques. The planned switch to a shorter wavelength extreme ultraviolet (EUV) source presents a challenge for the associated photoresists, which in their current manifestation show much poorer photoabsorption cross sections for the same dose. Here we consider the critical role that an inner-shell electronic structure might play in enhancing photoabsorption cross sections, which one can control by the choice of substituent elements in the photoresist. In order to increase the EUV sensitivity of current photoresists, it is critical to consider the inner-shell atomic structure of the elements that compose the materials. We validate this hypothesis using a series of halogenated organic molecules, which all have similar valence structures, but differ in the character of their semi-core and deep valence levels. Using various implementations of time-dependent density functional theory, the absorption cross sections are computed for the model systems of CH3X, X = H, OH, F, Cl, Br, I, as well as a representative polymer fragment: 2-methyl-phenol and its halogenated analogues. Iodine has a particularly high cross section in the EUV range, which is due to delayed absorption by its 4d electrons. The computational results are compared to standard database values and experimental data when available. Generally we find that the states that dominate the EUV oscillator strength are generated by excitations of deep valence or semi-core electrons, which are primarily atomic-like and relatively insensitive to the specific molecular structure.

  18. Design of the detector to observe the energetic charged particles: a part of the solar X-ray spectrophotometer ChemiX onboard Interhelio-Probe mission

    Science.gov (United States)

    Dudnik, Oleksiy; Sylwester, Janusz; Kowalinski, Miroslaw; Bakala, Jaroslaw; Siarkowski, Marek; Evgen Kurbatov, mgr..

    2016-07-01

    -layer detector stack: first two layers consist of silicon detectors; the third one is based on the p-terphenyl scintillation detector coupled with pixelated silicon photomultiplier. Coincidence logic allows collecting systematic data on particle variety and their energy with 1 and/or 10 s time resolutions. Digital processing unit is constructed based on FPGA Actel ProAsic M1A3PE1500, and contains each event processing logic, forms telemetry data and housekeeping frames, communicates with ChemiX digital processing unit and executes received telecommands. In order to increase the reliability and time resource of the BPM its digital processing unit and secondary power supply unit has backup sets. Switching between backup sets is commanded by externally orders. The BPM is capable to sort out in situ abundances of individual particle constituents from electrons up to oxygen nuclei. 1. O.V.Dudnik, E.V.Kurbatov, V.O.Tarasov, L.A.Andryushenko, I.L.Zajtsevsky, J.Sylwester, J.Bąkala, M.Kowaliński. Background particle detector for the solar X-ray photometer ChemiX of space mission "Interhelioprobe": an adjustment of breadboard model modules (in Russian) / ISSN 1561-8889: Kosmichna Nauka I Tekhnologiya, 2015, Vol.21, No.2, P.3-14. 2. O.V.Dudnik, E.V.Kurbatov, J.Sylwester, M.Siarkowski, P.Podgórski, M.Kowaliński. Background Particle Monitor - a part of the solar X-ray spectrophotometer ChemiX: principles of the operation and construction / in: Abstracts of 15th Ukrainian conference on space research, Odesa, Ukraine, August 24-28, 2015, P.80, doi:10.13140/RG.2.1.2284.2649. 3. O.V.Dudnik, E.V.Kurbatov, M.Kowaliński, M.Siarkowski, P.Podgórski, J.Sylwester. Operational features of Background Particle Monitor, a vital part of the solar X-ray spectrophotometer ChemiX / in: Abstract book of the Conference "Progress on EUV&X-ray spectroscopy and imaging II", Wroclaw, Poland, November 17 19, 2015, P.9, doi:10.13140/RG.2.1.1184.3604.

  19. Influence of pressure on ion energy distribution functions in EUV-induced hydrogen plasmas

    Science.gov (United States)

    van de Ven, T. H. M.; Reefman, P.; de Meijere, C. A.; Banine, V. Y.; Beckers, J.

    2016-09-01

    Next-generation lithography tools currently use Extreme Ultraviolet (EUV) radiation to create even smaller features on computer chips. The high energy photons (92 eV) induce a plasma in the low pressure background gas by photoionization. Industries have realized that these plasmas are of significant importance with respect to machine lifetime because impacting ions affect exposed surfaces. The mass resolved ion energy distribution function (IEDF) is therefore one of the main plasma parameters of interest. In this research an ion mass spectrometer is used to investigate IEDFs of ions impacting on surfaces in EUV-induced plasmas. EUV radiation is focused into a vessel with a low pressure hydrogen environment. Here, photoionization creates free electrons with energies up to 76 eV, which further ionize the background gas. The influence of the pressure on plasma composition and IEDFs has been investigated in the range 0.1-10 Pa. In general the ion fluxes towards the surface increase with pressure. However, above 5 Pa the flux of H2+ is not affected by the increase in pressure due to the balance between the creation of H2+ and the conversion of H2+ to H3+. These results will be used to benchmark plasma scaling models and verify numerical simulations.

  20. Testing the Interstellar Wind Helium Flow Direction with Galileo Euvs Data

    Science.gov (United States)

    Pryor, W. R.; Simmons, K. E.; Ajello, J. M.; Tobiska, W. K.; Retherford, K. D.; Stern, S. A.; Feldman, P. D.; Frisch, P. C.; Bzowski, M.; Grava, C.

    2014-12-01

    Forty years of measurements of the flow of interstellar helium through the heliosphere suggest that variations of the flow direction with time are possible. We will model Galileo Extreme Ultraviolet Spectrometer (EUVS) data to determine the best-fitting flow direction and compare it to values obtained by other spacecraft. The Galileo EUVS (Hord et al., 1992) was mounted on the spinning part of the spacecraft and obtained interstellar wind hydrogen Lyman-alpha 121.6 nm and helium 58.4 nm data on great circles passing near the ecliptic poles during the interplanetary cruise phase of the mission and also during the Jupiter orbital phase of the mission. The Galileo hydrogen cruise data have been previously published (Hord et al., 1991, Pryor et al., 1992; 1996; 2001), but the helium data have not. Our model was previously used by Ajello et al., 1978, 1979 to model Mariner 10 interstellar wind helium data, and by Stern et al., 2012 and Feldman et al., 2012 to model the interplanetary helium background near the moon in Lunar Reconnaissance Orbiter (LRO) Lyman-alpha Mapping Project (LAMP) data. The model has been updated to include recent determinations of daily helium 58.4 nm solar flux variations and helium losses due to EUV photoionization and electron impact ionization.

  1. Curved focal plane extreme ultraviolet detector array for a EUV camera on CHANG E lander.

    Science.gov (United States)

    Ni, Q; Song, K; Liu, S; He, L; Chen, B; Yu, W

    2015-11-30

    A novel curved focal plane extreme ultraviolet (EUV) detector array designed for a moon-based EUV camera is demonstrated. The curved focal plane detector array operating in a pulse-counting mode consists of a curved microchannel plate (MCP) stack and an induced charge wedge-strip anode (WSA). The curved MCP is fabricated by firstly thermally slumping of the MCPs, and then followed by optical polishing and core glass etching. By using this technology, curved MCPs with a length-to-diameter (L/D) ratio of 80:1 and a radius of curvature of 150 mm have been successfully achieved. The performance of the curved MCP detector is fully characterized in terms of the background noise, pulse height distribution, gain, image linearity and spatial resolution. It is measured that a spatial resolution of 7.13 lp/mm can be achieved with a background noise of less than 0.3 counts/cm2⋅s. The characterization results indicate that the curved focal plane detector can fulfill the requirements of the moon-based EUV camera.

  2. EUV mask blank defect inspection strategies for 32-nm half-pitch and beyond

    Science.gov (United States)

    Wurm, Stefan; Han, Hakseung; Kearney, Patrick; Cho, Wonil; Jeon, Chan-Uk; Gullikson, Eric

    2007-05-01

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into manufacturing. Evidently, the success of the industry's mask blank defect reduction effort will critically depend on the timely availability of defect inspection tools that can find ever smaller defects. The first generation of defect inspection tools enabled SEMATECH's Mask Blank Development Center (MBDC) to reduce mask blank defects to a level sufficient for use in EUV alpha tools. The second tool generation is currently enabling the MBDC to meet EUV pilot line requirements by the end of 2007. However, to meet high volume manufacturing (HVM) mask blank defect requirements for 32 nm half-pitch (hp) patterning, the industry needs a third generation of defect inspection tools. This next EUV inspection tool generation must be able to find defects of tools will also need to support extendibility assessments of low defect deposition technologies and the associated infrastructure towards meeting 22 nm half-pitch defect specifications. While visible light inspection is likely to support defect inspection needs for mask substrates over several technology nodes, the industry must explore other options for mask blanks and patterned masks. Evaluating the use of inexpensive printing tools and wafer-based inspection to search for repeating defects must be part of an overall strategy to address mask blank and patterned mask defect inspection.

  3. EUV emission stimulated by use of dual laser pulses from continus liquid microjet targets

    Science.gov (United States)

    Higashiguchi, Takeshi; Rajyaguru, Chirag; Sasaki, Wataru; Kubodera, Shoichi

    2004-11-01

    A continuous water-jet or water-jet mixed with LiF with several tens μm diameter was formed in a vacuum chamber through a small capillary nozzle. Usage of two laser pulses is an efficient way to produce EUV emission, since a density and temperature of a plasma formed by the first laser pulse are regulated by the second laser pulse. By adjusting the delay of the second pulse, one could maximize the EUV emission. A subpicosecond Ti:Sapphire laser at a wavelength of 800 nm produced a maximum energy around 30 mJ. The beam was divided by a Michelson interferometer, which produced two laser pulses with energies of 5 mJ. The pulse duration was adjusted around 300 fs (FWHM). Both beams were focused on a micro-jet using a lens with a focal length of 15 cm. The delay time between the two pulses was varied from 100 to 800 ps by use of an optical delay line. Clear enhancement of the EUV emission yield was observed when the delay between the two pulses was around 500 ps. The experimentally observed delay agrees reasonably well with that of a plasma to expand to its critical density of 10^21 cm-3.

  4. Background pressure effects on EUV source efficiency and produced debris characteristics

    Science.gov (United States)

    Sizyuk, Tatyana

    2017-03-01

    The cost of future computer chips, among other things, will depend on the performance of EUV sources and on the duration of the efficient operation and lifetime of nanolithography devices. While the efficiency of the sources is continuously being improved, their operational cycle is still highly restricted due to optical mirrors degradation as well as necessity of cleaning chamber environment and components. One of the potential problems of EUV sources for high volume manufacture (HVM) regimes can be related to the contamination of chamber environment by products of preceding laser pulse/droplet interactions. Implementation of high, 100 kHz and higher, repetition rate of devices for Sn droplets and laser pulses generation can cause high accumulation of tin in the chamber in the form of vapor/clusters. Possible tin accumulation in the chamber in dependence on laser parameters and mitigation system efficiency was evaluated. Then, the effects of various pressures of tin vapor on the CO2 and Nd:YAG laser beams propagation and on the size, the intensity, and the efficiency of EUV sources produced were studied.

  5. Study of the early phase of a Coronal Mass Ejection driven shock in EUV images

    Science.gov (United States)

    Frassati, Federica; Susino, Roberto; Mancuso, Salvatore; Bemporad, Alessandro

    2017-10-01

    The November 1st, 2014 prominence eruption (associated with a C2.7 class flare) resulted in a fast, partial-halo Coronal Mass Ejection (CME). During its early propagation, the CME produced a type II radio burst (seen by the Bruny Island Radio Spectrometer) starting around 04:57 UT when the front entered into the LASCO/C2 field of view (FOV) and the top of the CME front was at the heliocentric distance of about 2.5 R_{⊙}. In order to identify the source of the type II radio burst, we studied the kinematic of the eruption with EUV images acquired by SDO/AIA. Profiles of the observed EUV front speed have been compared with the Alfvén speed profiles derived by combining the plasma electron densities obtained from Emission Measure analysis and model magnetic fields extrapolated on the plane of the sky. Our results show that the northern half of the front became super-Alfvénic at approximately the same time when the type-II radio burst started. A comparison between the starting frequency of the type II emission and the frequencies corresponding to the coronal densities of the locations where the EUV front became super-Alfvénic suggests that the radio sources should be located in the northern flank of the front.

  6. 4-D modeling of CME expansion and EUV dimming observed with STEREO/EUVI

    Directory of Open Access Journals (Sweden)

    M. J. Aschwanden

    2009-08-01

    Full Text Available This is the first attempt to model the kinematics of a CME launch and the resulting EUV dimming quantitatively with a self-consistent model. Our 4-D-model assumes self-similar expansion of a spherical CME geometry that consists of a CME front with density compression and a cavity with density rarefaction, satisfying mass conservation of the total CME and swept-up corona. The model contains 14 free parameters and is fitted to the 25 March 2008 CME event observed with STEREO/A and B. Our model is able to reproduce the observed CME expansion and related EUV dimming during the initial phase from 18:30 UT to 19:00 UT. The CME kinematics can be characterized by a constant acceleration (i.e., a constant magnetic driving force. While the observations of EUVI/A are consistent with a spherical bubble geometry, we detect significant asymmetries and density inhomogeneities with EUVI/B. This new forward-modeling method demonstrates how the observed EUV dimming can be used to model physical parameters of the CME source region, the CME geometry, and CME kinematics.

  7. Performance assessment of the TDRSS Onboard Navigation System (TONS) experiment on EP/EUVE

    Science.gov (United States)

    Gramling, C. J.; Hart, R. C.; Teles, Jerome; Long, A. C.; Maher, M. J.

    1993-01-01

    The National Aeronautics and Space Administration (NASA) Goddard Space Flight Center (GSFC) is currently developing an operational Tracking and Data Relay Satellite (TDRS) System (TDRSS) Onboard Navigation System (TONS) to provide onboard knowledge of high-accuracy navigation products autonomously to users of TDRSS and its successor, TDRS-2. A TONS experiment has been implemented on the Explorer Platform/Extreme Ultraviolet Explorer (EP/EUVE) spacecraft, launched June 7, 1992, to flight qualify the TONS operational system using TDRSS forward-link communications services. This paper assesses the performance of the TONS flight hardware, an ultrastable oscillator (USO) and Doppler extractor (DE) card in one of the TDRSS user transponders, and the protoype flight software, based on the TONS experiment results. An overview of onboard navigation via TDRSS is also presented for both the EP/EUVE experiment and for future users of TONS. USO and DE short-term and long-term stability performance has been excellent. TONS Flight Software analysis indicates that position accuracies of better than 25 meters root-mean-square are achievable with tracking every one to two orbits, for the EP/EUVE 525-kilometer altitudes, 28.5-degree inclination orbit. The success of the TONS experiment demonstrates the flight readiness of TONS, which is scheduled to provide autonomous navigation for the Earth Observing System (EOS)-AM mission.

  8. Contribution of the Enterococcal Surface Protein Esp to pathogenesis of Enterococcus faecium endocarditis

    Science.gov (United States)

    Heikens, Esther; Singh, Kavindra V.; Jacques-Palaz, Karen D.; van Luit-Asbroek, Miranda; Oostdijk, Evelien A. N.; Bonten, Marc J. M.; Murray, Barbara E.; Willems, Rob J. L.

    2011-01-01

    The enterococcal surface protein Esp, specifically linked to nosocomial Enterococcus faecium, is involved in biofilm formation. To assess the role of Esp in endocarditis, a biofilm-associated infection, an Esp-expressing E. faecium strain (E1162) or its Esp-deficient mutant (E1162Δesp) were inoculated through a catheter into the left ventricle of rats. After 24 hours, less E1162Δesp than E1162 were recovered from heart valve vegetations. In addition, anti-Esp antibodies were detected in Esp-positive E. faecium bacteremia and endocarditis patient sera. In conclusion, Esp contributes to colonization of E. faecium at the heart valves. Furthermore, systemic infection elicits an Esp-specific antibody response in humans. PMID:21911077

  9. Contribution of the enterococcal surface protein Esp to pathogenesis of Enterococcus faecium endocarditis.

    Science.gov (United States)

    Heikens, Esther; Singh, Kavindra V; Jacques-Palaz, Karen D; van Luit-Asbroek, Miranda; Oostdijk, Evelien A N; Bonten, Marc J M; Murray, Barbara E; Willems, Rob J L

    2011-12-01

    The enterococcal surface protein Esp, specifically linked to nosocomial Enterococcus faecium, is involved in biofilm formation. To assess the role of Esp in endocarditis, a biofilm-associated infection, an Esp-expressing E. faecium strain (E1162) or its Esp-deficient mutant (E1162Δesp) were inoculated through a catheter into the left ventricle of rats. After 24 h, less E1162Δesp than E1162 were recovered from heart valve vegetations. In addition, anti-Esp antibodies were detected in Esp-positive E. faecium bacteremia and endocarditis patient sera. In conclusion, Esp contributes to colonization of E. faecium at the heart valves. Furthermore, systemic infection elicits an Esp-specific antibody response in humans. Copyright © 2011 Institut Pasteur. All rights reserved.

  10. The impact of the ozone effective temperature on satellite validation using the Dobson spectrophotometer network

    Science.gov (United States)

    Elissavet Koukouli, Maria; Zara, Marina; Lerot, Christophe; Fragkos, Konstantinos; Balis, Dimitris; van Roozendael, Michel; Antonius Franciscus Allart, Marcus; van der A, Ronald Johannes

    2016-05-01

    The main aim of the paper is to demonstrate an approach for post-processing of the Dobson spectrophotometers' total ozone columns (TOCs) in order to compensate for their known stratospheric effective temperature (Teff) dependency and its resulting effect on the usage of the Dobson TOCs for satellite TOCs' validation. The Dobson observations employed are those routinely submitted to the World Ozone and Ultraviolet Data Centre (WOUDC) of the World Meteorological Organization, whereas the effective temperatures have been extracted from two sources: the European Space Agency, ESA, Ozone Climate Change Initiative, Ozone-CCI, GODFIT version 3 (GOME-type Direct FITting) algorithm applied to the GOME2/MetopA, GOME2A, observations as well as the one derived from the European Centre for Medium-Range Weather Forecasts (ECMWF) outputs. Both temperature sources are evaluated utilizing co-located ozonesonde measurements also retrieved from the WOUDC database. Both GODFIT_v3 and ECMWF Teffs are found to be unbiased against the ozonesonde observations and to agree with high correlation coefficients, especially for latitudes characterized by high seasonal variability in Teff. The validation analysis shows that, when applying the GODFIT_v3 effective temperatures in order to post-process the Dobson TOC, the mean difference between Dobson and GOME2A GODFIT_v3 TOCs moves from 0.63 ± 0.66 to 0.26 ± 0.46 % in the Northern Hemisphere and from 1.25 ± 1.20 to 0.80 ± 0.71 % in the Southern Hemisphere. The existing solar zenith angle dependency of the differences has been smoothed out, with near-zero dependency up to the 60-65° bin and the highest deviation decreasing from 2.38 ± 6.6 to 1.37 ± 6.4 % for the 80-85° bin. We conclude that the global-scale validation of satellite TOCs against collocated Dobson measurements benefits from a post-correction using suitably estimated Teffs.

  11. A comparison of human raters and an intra-oral spectrophotometer.

    Science.gov (United States)

    Browning, William D; Chan, Daniel C; Blalock, John S; Brackett, Martha G

    2009-01-01

    Consistently choosing an accurate shade match is far more difficult than it appears. Recently, several electronic shade-matching devices have been marketed. One device is an intraoral spectrophotometer, Easyshade. The current study compared the accuracy and consistency of the Easyshade (ES) device to three clinicians experienced in tooth whitening trials and trained in the use of the Vitapan 3D Master shade. The maxillary anteriors of 16 participants were matched on three separate occasions one month apart. At each appointment, the three clinicians (R1, R2 & R3) and ES independently chose a single 3D Master tab. A trained research assistant used the Easyshade device to record CIE L*, C* and H* and a shade tab. In addition, color differences between shade tabs were calculated using the Delta E 2000 (delta e 00) formula. The CIE L*C*H* data were also used to establish standards for the five lightness groups of the 3D Master. An intrarater agreement was evaluated using an intraclass correlation statistic, and an inter-rater agreement was evaluated using a weighted Kappa statistic. The percentages of exact matches were: ES = 41%; R1 = 27%; R2 = 22% and R3 = 17%. Matches within a half-shade were also calculated. This represents a mismatch that is perceptible but acceptable. The percentages of matches within a half-tab were: ES = 91%; R1 = 69%; R2 = 85% and R3 = 79%. In terms of lightness, the intra-rater agreement was considered to be very good for ES and R2 and good for R1 and R3. For chroma, agreement for ES was considered good, and for the three clinicians, it was considered moderate. The mean color difference for the L*, C*, H* data recorded at each evaluation was 1.5, or only slightly greater than the color difference between the same tab on different guides (1.2). The delta e 00 data were the most accurate data collected, and they were used to establish a standard to which the tab choices of the four raters were compared. A weighted Kappa statistic was performed

  12. [BPNN simulation of photocatalytic degradation of reactive scarlet BES by UV-Vis spectrophotometer].

    Science.gov (United States)

    Zhang, Yun-Tao; He, Guo-Li; Xiang, Ming-Li

    2009-10-01

    The use of chemometric techniques and multivariate experimental designs for the photocatalytic reaction of reactive scarlet BES in aqueous solution under ultraviolet light irradiation is described. The efficiency of photocatalytic degradation was evaluated by the analysis of the parameter of decoloration efficiency determined by UV absorption at 540 nm using a UV-Vis spectrophotometer in different conditions. Five factors, such as the amount of titanium oxide ([TiO2]), the concentrations of reactive scarlet BES (c(0)), irradiation time (t), the pH value (pH) and temperature (T), were studied. [TiO2]. c(0), t and pH selected on the basis of the results of variance analysis by Plackett-Burman design were used as independent variables. Training sets and test sets of back propagation neural network (BPNN) were formed by Box-Behnken design and uniform design U10 (10 x 5(2) x 2) respectively. The process of photocatalytic degradation of the target object was simulated by the BPNN model. The correlation coefficient (r) of the calculation results for training set and test set by BPNN is 0.996 4 and 0.963 6 respectively, and the mean relative errors between the predictive value and experimental value of decoloration efficiency are 6.14 and 7.76, respectively. The modeled BPNN was applied to analyze the influence of four factors on decoloration efficiency. The results showed that the initial conditions of c(0) being lower, pH 5.0 and appropriate amount of [TiO2] contribute to improving the decoloration efficiency of reactive scarlet BES. Under the condition of c(0) = 40 mg x L(-1), the optimized experimental condition of the system was obtained: [TiO2] = 1.20 g x L(-1) and pH 5.0. Under the optimized experimental condition, the experimental value of decoloration efficiency is 98.20% when irradiation time is 35 minutes and the predictive value of decoloration efficiency is 99.16% under the same condition. The relative error of decoloration efficiency between the predictive

  13. Dissolution and assaying of multicomponent tablets by chemometric methods using computer-aided spectrophotometer.

    Science.gov (United States)

    Dinç, E; Serin, C; Tuğcu-Demiröz, F; Doğanay, T

    2003-01-16

    Dissolution of three component tablets containing paracetamol (APAP), propyphenazone (PP), and caffeine (CAF) was carried out by USP paddle method. Three chemometric methods; inverse least square (ILS), principal component regression (PCR) and partial least squares (PLS) were applied to simultaneous assay of APAP, PP and CAF in tablets. The PCR, PLS and ILS methods were applied to simultaneous dissolution APAP, PP and CAF in tablets using a double beam UV-Vis spectrophotometer without any chemical separation and any graphical treatment of the overlapping spectra of three drugs. Twenty two mixture solutions in different concentrations were prepared in simulated gastric juice (SGJ, USP) for the chemometric calibrations as training set. The absorbance data matrix was obtained by measuring the absorbance at 14 wavelength points (from 222.5 to 292.5 nm) with the intervals of 5 nm (Deltalambda=5 nm) in the spectral region between 200 and 310 nm. Training set and absorbance data were used for the calibrations of chemometric methods. The developed calibrations were tested for the previously prepared solutions of mixture of three drugs for the validation of the assay method. The chemometric calculations were performed by using the 'MAPLE VRSQUO; software. The results of three chemometric methods were statistically compared with each other. These chemometric calibrations were successfully applied to the content uniformity and dissolution of the multicomponent tablets without any separation procedure. The synthetic mixtures of three drugs were used for the validity of the calibrations. Means recoveries (percent) and relative standard deviation of PLS, PCR and ILS methods were found to be 100.1+/-0.6, 101.4+/-1.6 and 100.1+/-0.6 for APAP; 100.9+/-3.2, 102.0+/-3.3 and 100.9+/-3.2 for PP; 99.9+/-3.5, 101.6+/-3.3 and 99.9+/-3.2 for CAF, respectively. Dissolution profiles of three component tablets were performed. More than 95% of drugs were dissolved within 15 min. All of the

  14. Esp-independent biofilm formation by Enterococcus faecalis.

    Science.gov (United States)

    Kristich, Christopher J; Li, Yung-Hua; Cvitkovitch, Dennis G; Dunny, Gary M

    2004-01-01

    Enterococcus faecalis is a gram-positive opportunistic pathogen known to form biofilms in vitro. In addition, this organism is often isolated from biofilms on the surfaces of various indwelling medical devices. However, the molecular mechanisms regulating biofilm formation in these clinical isolates are largely unknown. Recent work has suggested that a specific cell surface protein (Esp) of E. faecalis is critical for biofilm formation by this organism. However, in the same study, esp-deficient strains of E. faecalis were found to be capable of biofilm formation. To test the hypothesis that Esp is dispensable for biofilm formation by E. faecalis, we used microtiter plate assays and a chemostat-based biofilm fermentor assay to examine biofilm formation by genetically well-defined, non-Esp-expressing strains. Our results demonstrate that in vitro biofilm formation occurs, not only in the absence of esp, but also in the absence of the entire pathogenicity island that harbors the esp coding sequence. Using scanning electron microscopy to evaluate biofilms of E. faecalis OG1RF grown in the fermentor system, biofilm development was observed to progress through multiple stages, including attachment of individual cells to the substratum, microcolony formation, and maturation into complex multilayered structures apparently containing water channels. Microtiter plate biofilm analyses indicated that biofilm formation or maintenance was modulated by environmental conditions. Furthermore, our results demonstrate that expression of a secreted metalloprotease, GelE, enhances biofilm formation by E. faecalis. In summary, E. faecalis forms complex biofilms by a process that is sensitive to environmental conditions and does not require the Esp surface protein.

  15. Applications of compact laser-driven EUV/XUV plasma sources

    Science.gov (United States)

    Barkusky, Frank; Bayer, Armin; Döring, Stefan; Flöter, Bernhard; Großmann, Peter; Peth, Christian; Reese, Michael; Mann, Klaus

    2009-05-01

    In recent years, technological developments in the area of extreme ultraviolet lithography (EUVL) have experienced great improvements. So far, intense light sources based on discharge or laser plasmas, beam steering and imaging optics as well as sensitive detectors are available. Currently, applications of EUV radiation apart from microlithography, such as metrology, high-resolution microscopy, or surface analysis come more and more into focus. In this contribution we present an overview on the EUV/XUV activities of the Laser-Laboratorium Göttingen based on table-top laser-produced plasma (LPP) sources. As target materials gaseous or liquid jets of noble gases or solid Gold are employed. Depending on the applications, the very clean but low intense gaseous targets are mainly used for metrology, whereas the targets for high brilliances (liquid, solid) are used for microscopy and direct structuring. For the determination of interaction mechanisms between EUV radiation and matter, currently the solid Gold target is used. In order to obtain a small focal spot resulting in high EUV fluence, a modified Schwarzschild objective consisting of two spherical mirrors with Mo/Si multilayer coatings is adapted to this source. By demagnified (10x) imaging of the Au plasma an EUV spot of 3 μm diameter with a maximum energy density of ~1.3 J/cm2 is generated (pulse duration 8.8 ns). First applications of this integrated source and optics system reveal its potential for high-resolution modification and direct structuring of solid surfaces. For chemical analysis of various samples a NEXAFS setup was developed. It consists of a LPP, using gaseous Krypton as a broadband emitter in the water-window range, as well as a flat field spectrograph. The laboratory system is set to the XUV spectral range around the carbon K-edge (4.4 nm). The table-top setup allows measurements with spectral accuracy comparable to synchrotron experiments. NEXAFS-experiments in transmission and reflection are

  16. Interexaminer reliability in clinical measurement of L*C*h* values of anterior teeth using a spectrophotometer.

    Science.gov (United States)

    Hassel, Alexander J; Grossmann, Anne-christiane; Schmitter, Marc; Balke, Zibandeh; Buzello, Anja M

    2007-01-01

    The objective of this study was to investigate interexaminer reliability in the clinical measurement of the L*C*h* (lightness/value, chroma, hue) values of anterior teeth using a spectrophotometer (Vita Easyshade). The basic color of the maxillary right central incisors and canines of 23 subjects was spectrophotometrically determined by 4 clinicians and an experienced user (development manager) of the spectrophotometer. Also, to analyze the effect of different training with the instrument on interexaminer reliability, 2 of the clinicians were instructed in the use of the spectrophotometer by the experienced examiner, whereas the others instructed themselves by studying the operating manual. Agreement between all examiners was acceptable to excellent (intraclass coefficient > 0.4). The mean value of the measured differences for the central incisors of all subjects for L* values was 5 (for C* = 3.8, h* = 2.7 degrees) and for canines, the mean L* was 4.5 (C* = 3, h* = 1.6 degrees). Results from comparison of the 2 different training methods were inconsistent. Agreement with the experienced examiner ranged from not acceptable (C* values for incisors of self-instructed examiners) to excellent. The distribution of the measurements of 1 subject could lead to deviations in color, probably with clinical impact. For canines, the measurements were at least equally reproducible (in some cases significantly more reproducible) compared to central incisors. Because of the small number of examiners and the inconsistent results, it was not possible to reach a definite conclusion about the effect of different training methods on interexaminer reliability.

  17. Sensitivity of digital dental photo CIE L*a*b* analysis compared to spectrophotometer clinical assessments over 6 months.

    Science.gov (United States)

    Sluzker, Ariel; Knösel, Michael; Athanasiou, Athanasios E

    2011-10-01

    To assess the sensitivity of digital dental photo CIE L*a*b* analysis compared to clinical spectrophotometer assessments over 6 months. CIE L*a*b* values for the upper right central incisors of 14 predoctoral dental students subjected to certain color-relevant exclusion criteria were recorded at baseline (T0), after 6 months (T1), and 1 week later (T2), using (Method 1) a spectrophotometer and (Method 2) a method of digital photo analysis. Statistical analysis of color and lightness data between both methods and time points were assessed using the Shapiro-Wilk test, Pearson's correlation coefficient (r), Dahlberg's formula for method error calculation, and paired samples t-tests, adopting a level of significance alpha = 0.05. Between T0 - T1, the spectrophotometer recorded significant changes in lightness (75.51 > 77.75) and color values (a*: 3.25 > 2.38; b*: 18.47 > 17.31), whereas significant changes with Method 2 were only seen for b* (21.51 > 20.57). No significant changes for overall color and lightness changes deltaE to deltaE2 were found for either of the methods. The error of the method (T1-T2) and corresponding correlation coefficients r for values L*a*b* were found to be 1.44 / 0.43 / 0.62 (r: 0.69; P = 0.007/0.64; P = 0.14/0.9; P < 0.001) for Method 1 and 0.97/0.67/1.25 (r : 0.87; P < 0.001/0.63; P = 0.17/0.57, P = 0.04) for Method 2, respectively.

  18. Cross-validity of a portable glucose capillary monitors in relation to enzymatic spectrophotometer methods

    Directory of Open Access Journals (Sweden)

    William Alves Lima

    2006-09-01

    Full Text Available The glucose is an important substrate utilizaded during exercise. Accurate measurement of glucose is vital to obtain trustworthy results. The enzymatic spectrophotometer methods are generally considered the “goldstandard” laboratory procedure for measuring of glucose (GEnz, is time consuming, costly, and inappropriate for large scale field testing. Compact and portable glucose monitors (GAccu are quick and easy methods to assess glucose on large numbers of subjects. So, this study aimed to test the cross-validity of GAccu. The sample was composed of 107 men (aged= 35.4±10.7 years; stature= 168.4±6.9 cm; body mass= 73.4±11.2 kg; %fat= 20.9±8.3% – by dual energy x-ray absorptiometry. Blood for measuring fasting glucose was taken in basilar vein (Genz, Bioplus: Bio-2000 and in ring finger (GAccu: Accu-Chek© Advantage©, after a 12-hour overnight fast. GEnz was used as the criterion for cross-validity. Paired t-test shown differences (p RESUMO A glicose é um substrato importante utilizado durante o exercício físico. Medidas acuradas da glicose são fundamentais para a obtenção de resultados confiáveis. O método laboratorial de espectrofotometria enzimática geralmente é considerado o procedimento “padrão ouro” para medir a glicose (GEnz, o qual requer tempo, custo e é inapropriado para o uso em larga escala. Monitores portáteis de glicose (GAccu são rápidos e fáceis para medir a glicose em um grande número de sujeitos. Então, este estudo teve por objetivo testar a validade concorrente do GAccu. A amostra foi composta por 107 homens (idade= 35,4±10,7 anos; estatura= 168,4±6,9 cm; massa corporal= 73,4±11,2 kg; %gordura= 20,9±8,3% – por absortometria de raio-x de dupla energia. O sangue para mensurar a glicose em jejum foi tirado na veia basilar (Genz, Bioplus: Bio-2000 e no dedo anular (GAccu - Accu- Chek© Advantage©, depois de 12h de jejum noturno. O GEnz foi usado como critério para testar a validade

  19. Demonstration of defect free EUV mask for 22nm NAND flash contact layer using electron beam inspection system

    Science.gov (United States)

    Shimomura, Takeya; Kawashima, Satoshi; Inazuki, Yuichi; Abe, Tsukasa; Takikawa, Tadahiko; Mohri, Hiroshi; Hayashi, Naoya; Wang, Fei; Ma, Long Eric; Zhao, Yan; Kuan, Chiyan; Xiao, Hong; Jau, Jack

    2011-04-01

    Fabrication of defect free EUV masks including their inspection is the most critical challenge for implementing EUV lithography into semiconductor high volume manufacturing (HVM) beyond 22nm half-pitch (HP) node. The contact to bit-line (CB) layers of NAND flash devices are the most likely the first lithography layers that EUV will be employed for manufacturing due to the aggressive scaling and the difficulty for making the pattern with the current ArF lithography. To assure the defect free EUV mask, we have evaluated electron beam inspection (EBI) system eXplore™ 5200 developed by Hermes Microvision, Inc. (HMI) [1]. As one knows, the main issue of EBI system is the low throughput. To solve this challenge, a function called Lightning Scan™ mode has been recently developed and installed in the system, which allows the system to only inspect the pattern areas while ignoring blanket areas, thus dramatically reduced the overhead time and enable us to inspect CB layers of NAND Flash device with much higher throughput. In this present work, we compared the Lightning scan mode with Normal scan mode on sensitivity and throughput. We found out the Lightning scan mode can improve throughput by a factor of 10 without any sacrifices of sensitivity. Furthermore, using the Lightning scan mode, we demonstrated the possibility to fabricate the defect free EUV masks with moderate inspection time.

  20. Espécies vegetais indicadas na odontologia

    OpenAIRE

    Oliveira, Francielda Q.; Gobira,Bárbara; Guimarães, Carolina; Batista,Jamylle; Barreto, Mariana; Souza, Mônica

    2007-01-01

    Foi realizada uma revisão bibliográfica sobre plantas medicinais indicadas para afecções odontológicas, incluindo livros, artigos e sites científicos e populares. Os dados foram compilados em uma tabela contendo informações como nome científico, popular, família, parte utilizada e forma farmacêutica. Foram encontradas 132 espécies, distribuídas em 52 Famílias Botânicas citadas como úteis no tratamento de afecções odontológicas. As espécies mais citadas de acordo com a bibliografia consultada ...

  1. Creativity in Building ESP Vocabulary in the Context Of ICT

    Directory of Open Access Journals (Sweden)

    Alvyda Liuolienė

    2013-06-01

    Full Text Available The article aims at analyzing various creative methods of expanding students’ ESP vocabulary – the basic tool for communication and knowledge – in the context of ICT. The authors tackle traditional ways of using authentic texts and proceed with innovative methods of ESP vocabulary building such as using the Internet as an extremely diverse source of activities as well as emphasize the advantages of mock trials for law students and the most challenging activities – presentations and project-based learning. The framework of ICT offers numerous integrated and interactive materials and creative ways of vocabulary building.

  2. Synergistic effect of EUV from the laser-sustained detonation plasma in a ground-based atomic oxygen simulation on fluorinated polymers

    Science.gov (United States)

    Tagawa, Masahito; Abe, Shingo; Kishida, Kazuhiro; Yokota, Kumiko; Okamoto, Akio

    2009-01-01

    The contribution of extreme ultraviolet (EUV) from a laser-sustained plasma on the mass loss phenomenon of fluorinated polymer in a ground-based laser-detonation atomic oxygen beam source was evaluated. The atomic oxygen beam and EUV from the oxygen plasma were separated by the high-speed chopper wheel installed in the beam source. The mass changes of the fluorinated polymer and polyimide were measured from the frequency shift of the quartz crystal microbalance during the beam exposures. It has been made clear that the fluorinated polymer erodes by EUV exposure alone. In contrast, no erosion was detected for polyimide by EUV alone. The atomic oxygen-induced erosion was measured for both materials even without EUV exposure. However, no strong synergistic effect was observed for a fluorinated polymer even under the simultaneous exposure condition of atomic oxygen and EUV. Similar results were observed even in simultaneous exposure of atomic oxygen (without EUV) and 172 nm vacuum ultraviolet (VUV) from an excimer lamp. These experiments suggest that the primary origin of the accelerated erosion of fluorinated polymer observed in a laser detonation atomic oxygen source is not the EUV from the laser-sustained plasma.

  3. Uncovering New Thermal and Elastic Properties of Nanostructured Materials Using Coherent EUV Light

    Science.gov (United States)

    Hernandez Charpak, Jorge Nicolas

    Advances in nanofabrication have pushed the characteristic dimensions of nanosystems well below 100nm, where physical properties are often significantly different from their bulk counterparts, and accurate models are lacking. Critical technologies such as thermoelectrics for energy harvesting, nanoparticle-mediated thermal therapy, nano-enhanced photovoltaics, and efficient thermal management in integrated circuits depend on our increased understanding of the nanoscale. However, traditional microscopic characterization tools face fundamental limits at the nanoscale. Theoretical efforts to build a fundamental picture of nanoscale thermal dynamics lack experimental validation and still struggle to account for newly reported behaviors. Moreover, precise characterization of the elastic behavior of nanostructured systems is needed for understanding the unique physics that become apparent in small-scale systems, such as thickness-dependent or fabrication-dependent elastic properties. In essence, our ability to fabricate nanosystems has outstripped our ability to understand and characterize them. In my PhD thesis, I present the development and refinement of coherent extreme ultraviolet (EUV) nanometrology, a novel tool used to probe material properties at the intrinsic time- and length-scales of nanoscale dynamics. By extending ultrafast photoacoustic and thermal metrology techniques to very short probing wavelengths using tabletop coherent EUV beams from high-harmonic upconversion (HHG) of femtosecond lasers, coherent EUV nanometrology allows for a new window into nanoscale physics, previously unavailable with traditional techniques. Using this technique, I was able to probe both thermal and acoustic dynamics in nanostructured systems with characteristic dimensions below 50nm with high temporal (sub-ps) and spatial (work is needed for a full theoretical quantitative picture of the experimental results. In other work, I used coherent EUV nanometrology to simultaneously

  4. EUV radiation from pinching discharges of magnetoplasma compressor type and its dependence on the dynamics of compression zone formation

    Science.gov (United States)

    Garkusha, I. E.; Cherednychenko, T. N.; Ladygina, M. S.; Makhlay, V. A.; Petrov, Yu V.; Solyakov, D. G.; Staltsov, V. V.; Yelisyeyev, D. V.; Hassanein, A.

    2014-05-01

    This paper is devoted to the investigation of plasma stream parameters and the intensity of extreme ultraviolet (EUV) radiation from the compression zone in various modes of operation of a magnetoplasma compressor (MPC). Two gases of different masses, either helium or argon, were used for the ignition of MPC discharge under the residual pressure. The plasma stream density along the axis and the EUV radiation energy were measured. It was shown that the compression zone position depends on the initial density of the residual gas. The EUV radiation energy was measured with a calibrated AXUV in the wavelength range of 12.2-15.8 nm. It was revealed that the radiation energy increased by 30-50% with decreasing initial gas pressure.

  5. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    Science.gov (United States)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  6. EUV high resolution imager on-board solar orbiter: optical design and detector performances

    Science.gov (United States)

    Halain, J. P.; Mazzoli, A.; Rochus, P.; Renotte, E.; Stockman, Y.; Berghmans, D.; BenMoussa, A.; Auchère, F.

    2017-11-01

    The EUV high resolution imager (HRI) channel of the Extreme Ultraviolet Imager (EUI) on-board Solar Orbiter will observe the solar atmospheric layers at 17.4 nm wavelength with a 200 km resolution. The HRI channel is based on a compact two mirrors off-axis design. The spectral selection is obtained by a multilayer coating deposited on the mirrors and by redundant Aluminum filters rejecting the visible and infrared light. The detector is a 2k x 2k array back-thinned silicon CMOS-APS with 10 μm pixel pitch, sensitive in the EUV wavelength range. Due to the instrument compactness and the constraints on the optical design, the channel performance is very sensitive to the manufacturing, alignments and settling errors. A trade-off between two optical layouts was therefore performed to select the final optical design and to improve the mirror mounts. The effect of diffraction by the filter mesh support and by the mirror diffusion has been included in the overall error budget. Manufacturing of mirror and mounts has started and will result in thermo-mechanical validation on the EUI instrument structural and thermal model (STM). Because of the limited channel entrance aperture and consequently the low input flux, the channel performance also relies on the detector EUV sensitivity, readout noise and dynamic range. Based on the characterization of a CMOS-APS back-side detector prototype, showing promising results, the EUI detector has been specified and is under development. These detectors will undergo a qualification program before being tested and integrated on the EUI instrument.

  7. Evaluating Printability of Buried Native EUV Mask Phase Defects through a Modeling and Simulation Approach

    Energy Technology Data Exchange (ETDEWEB)

    Upadhyaya, Mihir; Jindal, Vibhu; Basavalingappa, Adarsh; Herbol, Henry; Harris-Jones, Jenah; Jang, Il-Yong; Goldberg, Kenneth A.; Mochi, Iacopo; Marokkey, Sajan; Demmerle, Wolfgang; Pistor, Thomas V.; Denbeaux, Gregory

    2015-03-16

    The availability of defect-free masks is considered to be a critical issue for enabling extreme ultraviolet lithography (EUVL) as the next generation technology. Since completely defect-free masks will be hard to achieve, it is essential to have a good understanding of the printability of the native EUV mask defects. In this work, we performed a systematic study of native mask defects to understand the defect printability caused by them. The multilayer growth over native substrate mask blank defects was correlated to the multilayer growth over regular-shaped defects having similar profiles in terms of their width and height. To model the multilayer growth over the defects, a novel level-set multilayer growth model was used that took into account the tool deposition conditions of the Veeco Nexus ion beam deposition tool. The same tool was used for performing the actual deposition of the multilayer stack over the characterized native defects, thus ensuring a fair comparison between the actual multilayer growth over native defects, and modeled multilayer growth over regular-shaped defects. Further, the printability of the characterized native defects was studied with the SEMATECH-Berkeley Actinic Inspection Tool (AIT), an EUV mask-imaging microscope at Lawrence Berkeley National Laboratory (LBNL). Printability of the modeled regular-shaped defects, which were propagated up the multilayer stack using level-set growth model was studied using defect printability simulations implementing the waveguide algorithm. Good comparison was observed between AIT and the simulation results, thus demonstrating that multilayer growth over a defect is primarily a function of a defect’s width and height, irrespective of its shape. This would allow us to predict printability of the arbitrarily-shaped native EUV mask defects in a systematic and robust manner.

  8. Dawn-dusk difference of periodic oxygen EUV dayglow variations at Venus observed by Hisaki

    Science.gov (United States)

    Masunaga, Kei; Seki, Kanako; Terada, Naoki; Tsuchiya, Fuminori; Kimura, Tomoki; Yoshioka, Kazuo; Murakami, Go; Yamazaki, Atsushi; Tao, Chihiro; Leblanc, François; Yoshikawa, Ichiro

    2017-08-01

    We report a dawn-dusk difference of periodic variations of oxygen EUV dayglow (OII 83.4 nm, OI 130.4 nm and OI 135.6 nm) in the upper atmosphere of Venus observed by the Hisaki spacecraft in 2015. Observations show that the periodic dayglow variations are mainly controlled by the solar EUV flux. Additionally, we observed characteristic ∼1 day and ∼4 day periodicities in the OI 135.6 nm brightness. The ∼1 day periodicity was dominant on the duskside while the ∼4 day periodicity was dominant on the dawnside. Although the driver of the ∼1 day periodicity is still uncertain, we suggest that the ∼4 day periodicity is caused by gravity waves that propagate from the middle atmosphere. The thermospheric subsolar-antisolar flow and the gravity waves dominantly enhance eddy diffusion on the dawnside, and the eddy diffusion coefficient changes every ∼4 days due to large periodic modulations of wind velocity of the super-rotating atmosphere. Since the ∼4 day modulations on the dawnside are not continuously observed, it is possible that there is an intermittent coupling between the thermosphere and middle atmosphere due to variations of wave source altitudes. Moreover, if there are variations of the wind velocity in the mesosphere or lower thermosphere, it is possible that gravity waves occasionally propagate to the thermosphere even on the duskside due to periodic disappearance of the critical level and the ∼4 day periodic O atomic modulations occur. Thus, our observations imply that the ∼4 day periodicity of the EUV dayglow may reflect the dynamics of the middle atmosphere of Venus. We also examined the effects of the solar wind on the dayglow variations by shifting the solar wind measurements from earth to Venus. We did not find clear correlations between them. However, since there are no local measurements of the solar wind at Venus, the effect of the solar wind on the dayglow is still uncertain.

  9. Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method

    Science.gov (United States)

    Sato, Takashi; Takigawa, Tomoaki; Togashi, Yuta; Toida, Takumi; Echigo, Masatoshi; Harada, Tetsuo; Watanabe, Takeo; Kudo, Hiroto

    2017-10-01

    In this paper, we designed the synthesis of negative-type molecular resist materials for EB and EUVL exposure tools, and their properties were examined. The resist materials for EUVL have been required showing higher sensitivity for high throughput in the lithographic process, and expecting lower shot noise to improve a roughness. In EUVL process, the resist materials must be ionized by absorbing EUV to emit more secondary electrons. The EUV absorption of the synthesized resist materials was measured using their thin films on the silicon wafer, and it was observed that the ratio of EUV absorption of the synthesized resist was higher than in the comparison of that of PHS as a reference., i.e., 2.4 times higher absorption was shown. Furthermore, we examined the relationship between the ratios of EUV absorptions and functional groups of the resist materials. As the result, the sensitivity of resist materials under EUV exposure tool was consistent with their structures.

  10. The Foggy EUV Corona and Coronal Heating by MHD Waves from Explosive Reconnection Events

    Science.gov (United States)

    Moore, Ron L.; Cirtain, Jonathan W.; Falconer, David A.

    2008-01-01

    In 0.5 arcsec/pixel TRACE coronal EUV images, the corona rooted in active regions that are at the limb and are not flaring is seen to consist of (1) a complex array of discrete loops and plumes embedded in (2) a diffuse ambient component that shows no fine structure and gradually fades with height. For each of two not-flaring active regions, found that the diffuse component is (1) approximately isothermal and hydrostatic and (2) emits well over half of the total EUV luminosity of the active-region corona. Here, from a TRACE Fe XII coronal image of another not-flaring active region, the large sunspot active region AR 10652 when it was at the west limb on 30 July 2004, we separate the diffuse component from the discrete loop component by spatial filtering, and find that the diffuse component has about 60% of the total luminosity. If under much higher spatial resolution than that of TRACE (e. g., the 0.1 arcsec/pixel resolution of the Hi-C sounding-rocket experiment proposed by J. W. Cirtain et al), most of the diffuse component remains diffuse rather being resolved into very narrow loops and plumes, this will raise the possibility that the EUV corona in active regions consists of two basically different but comparably luminous components: one being the set of discrete bright loops and plumes and the other being a truly diffuse component filling the space between the discrete loops and plumes. This dichotomy would imply that there are two different but comparably powerful coronal heating mechanisms operating in active regions, one for the distinct loops and plumes and another for the diffuse component. We present a scenario in which (1) each discrete bright loop or plume is a flux tube that was recently reconnected in a burst of reconnection, and (2) the diffuse component is heated by MHD waves that are generated by these reconnection events and by other fine-scale explosive reconnection events, most of which occur in and below the base of the corona where they are

  11. The Development of a New Model of Solar EUV Irradiance Variability

    Science.gov (United States)

    Warren, Harry; Wagner, William J. (Technical Monitor)

    2002-01-01

    The goal of this research project is the development of a new model of solar EUV (Extreme Ultraviolet) irradiance variability. The model is based on combining differential emission measure distributions derived from spatially and spectrally resolved observations of active regions, coronal holes, and the quiet Sun with full-disk solar images. An initial version of this model was developed with earlier funding from NASA. The new version of the model developed with this research grant will incorporate observations from SoHO as well as updated compilations of atomic data. These improvements will make the model calculations much more accurate.

  12. ROSAT EUV and soft X-ray studies of atmospheric composition and structure in G191-B2B

    Science.gov (United States)

    Barstow, M. A.; Fleming, T. A.; Finley, D. S.; Koester, D.; Diamond, C. J.

    1993-01-01

    Previous studies of the hot DA white dwarf GI91-B2B have been unable to determine whether the observed soft X-ray and EUV opacity arises from a stratified hydrogen and helium atmosphere or from the presence of trace metals in the photosphere. New EUV and soft X-ray photometry of this star, made with the ROSAT observatory, when analyzed in conjunction with the earlier data, shows that the stratified models cannot account for the observed fluxes. Consequently, we conclude that trace metals must be a substantial source of opacity in the photosphere of G191-B2B.

  13. Improving Flare Irradiance Models with the Low Pass Filter Relation Between EUV Flare Emissions with Differing Formation Temperatures

    Science.gov (United States)

    Thiemann, Edward M. B.; Eparvier, Francis G.

    2016-10-01

    Solar flares are the result of magnetic reconnection in the solar corona which converts magnetic energy into kinetic energy resulting in the rapid heating of solar plasma. As this plasma cools, extreme ultraviolet (EUV) line emission intensities evolve as the plasma temperature passes through line formation temperatures, resulting in emission lines with cooler formation temperatures peaking after those with hotter formation temperatures. At the 2016 American Astronomical Society Solar Physics Division Meeting in Boulder (SPD2016), we showed that Fe XVIII solar flare light curves are highly correlated with Fe XXIII light curves that have been subjected to the single-pole Low Pass Filter Equation (LPFE) with a time constant equal to the time difference between the peak emissions. The single-pole (or equivalently, RC) LPFE appears frequently in analyses of systems which both store and dissipate heat, and the flare LPFE effect is believed to be related to the underlying cooling processes. Because the LPFE is constrained by a single parameter, this effect has implications for both operational EUV flare irradiance models and understanding thermal processes that occur in post-flare loops. At the time of SPD2016, it was ambiguous as to whether the LPFE effect relates hot thermal bremsstrahlung soft x-ray (SXR) or EUV line emissions with cooler EUV line emissions since Fe XXIII flare light curves are highly correlated with SXR flare light curves. In this study, we present new results characterizing the LPFE relation between multiple emission lines with differing formation temperatures ranging from 107.2 to 105.7 K observed by SDO/EVE and SXR thermal bremsstrahlung emissions observed by GOES/XRS. We show that the LPFE equation relates Fe XVIII with cooler EUV line emissions, providing unambiguous evidence that the LPFE effect exists between EUV line emissions rather than thermal bremsstrahlung and line emissions exclusively. The exact nature of this effect remains an open

  14. Post graduate ESP curriculum: reading and writing needs.

    Science.gov (United States)

    Dehnad, Afsaneh; Bagherzadeh, Rafat; Bigdeli, Shoaleh; Hatami, Kamran; Hosseini, Agha Fatemeh

    2014-01-01

    Assessing learners' needs is an integral part of any curriculum and course design , namely English for specific purposes (ESP), syllabus design, materials development, teaching methods and testing issues. Critical approach to needs analysis, which is a relatively recent approach, acknowledges the rights of different stakeholders including teachers, students and administrators in the process of needs analysis. However, there has been no formal need analysis for syllabus design at postgraduate level in Medical Universities affiliated to the Ministry of Health in Iran. This study, conducted in 2011, was an attempt to assess the reading and writing needs of postgraduate students in ESP courses on the basis of critical approach to needs analysis. The study population consisted of 67 people: 56 postgraduate students, 5 heads of departments, 5 ESP instructors and 1 executive manager at the Ministry of Health in Iran. Ethical and demographic forms, needs analysis questionnaires, and a form of semi-structured interview were the instruments of the study. According to the findings, there was a discrepancy between students' and instructors' perception of learners' needs and the assumed needs appearing in the syllabi prescribed by the Ministry of Health in Iran. This study showed that a call for critical needs analysis in which the rights of different stakeholders are acknowledged is necessary for meeting the requirements of any ESP classes especially at postgraduate level where the instructors and learners are fully aware of learners' needs.

  15. Post graduate ESP curriculum: reading and writing needs.

    Directory of Open Access Journals (Sweden)

    Afsaneh Dehnad

    2014-05-01

    Full Text Available Assessing learners' needs is an integral part of any curriculum and course design , namely English for specific purposes (ESP, syllabus design, materials development, teaching methods and testing issues. Critical approach to needs analysis, which is a relatively recent approach, acknowledges the rights of different stakeholders including teachers, students and administrators in the process of needs analysis. However, there has been no formal need analysis for syllabus design at postgraduate level in Medical Universities affiliated to the Ministry of Health in Iran. This study, conducted in 2011, was an attempt to assess the reading and writing needs of postgraduate students in ESP courses on the basis of critical approach to needs analysis. The study population consisted of 67 people: 56 postgraduate students, 5 heads of departments, 5 ESP instructors and 1 executive manager at the Ministry of Health in Iran. Ethical and demographic forms, needs analysis questionnaires, and a form of semi-structured interview were the instruments of the study. According to the findings, there was a discrepancy between students' and instructors' perception of learners' needs and the assumed needs appearing in the syllabi prescribed by the Ministry of Health in Iran. This study showed that a call for critical needs analysis in which the rights of different stakeholders are acknowledged is necessary for meeting the requirements of any ESP classes especially at postgraduate level where the instructors and learners are fully aware of learners' needs.

  16. Designing an ESP Curriculum for Saudi Science Students

    Science.gov (United States)

    Alfallaj, Fahad Saleh Suleiman

    2016-01-01

    The present study looks at available views on ESP especially for students of science both as an academic tool and as an occupational need. It also endeavours to present a curriculum for the undergraduate students of Science at Qassim University, KSA. It is an objective of the paper to propose a use and need based syllabus to prepare the learners…

  17. Pedagogical Applications of Vlogs: An Investigation into ESP Learners' Perceptions

    Science.gov (United States)

    Hung, Shao-Ting

    2011-01-01

    This study set out to examine the implementation of a video blog (vlog) project in an English for Specific Purposes (ESP) course that aimed to increase students' opportunities to use the target language. Specifically, it explored students' perceptions towards vlogs and analysed the advantages and disadvantages of vlogs as identified by the…

  18. EXPLORING THE MINDSETS OF ESP STUDENTS IN THE LIGHT ...

    African Journals Online (AJOL)

    At Iranian universities, English for Specific Purposes (ESP) courses are held for students majoring in different fields. These university students may have negative or unhelpful metaphors for language learning and teaching that reflect their negative attitudes toward these issues. Their negative ideas about language learning ...

  19. Autonomous Learning and Metacognitive Strategies Essentials in ESP Class

    Science.gov (United States)

    Ajideh, Parviz

    2009-01-01

    The reform in teaching and curriculum involves not only in the teaching content, but more so in teachers' methodology, the students' learning strategies and the changed relationship between students and teachers in the classroom setting. The purpose of this paper is to suggest that what is needed for ESP is a different orientation to English study…

  20. An ESP Approach to EFL/ESL Teacher Training.

    Science.gov (United States)

    Kennedy, Chris

    1983-01-01

    Presents a multilevel course model which applies English for Specific Purposes (ESP) principles to the design of teacher-training courses for "general" English as a Second Language teachers. The syllabus moves from content, through format and methodology, to the language required to understand content, while maintaining the subject-language link…

  1. Use of Authentic Materials in the ESP Classroom

    Science.gov (United States)

    Benavent, Gabriela Torregrosa; Penamaria, Sonsoles Sanchez-Reyes

    2011-01-01

    Authentic materials are especially important for ESP trainees, since they reproduce an immersion environment and provide a realistic context for tasks that relate to learners' needs. Realia and authentic materials increase learners' motivation but are difficult to adapt to the learner's level of language, especially at the beginning level. It is…

  2. A Bayes factor meta-analysis of Bem's ESP claim

    NARCIS (Netherlands)

    Rouder, Jeffrey N.; Morey, Richard D.

    In recent years, statisticians and psychologists have provided the critique that p-values do not capture the evidence afforded by data and are, consequently, ill suited for analysis in scientific endeavors. The issue is particular salient in the assessment of the recent evidence provided for ESP by

  3. Translating and Revising as Opportunities for ESP Teacher Development

    Science.gov (United States)

    Tatzl, Dietmar

    2013-01-01

    This microethnographic case study discusses the effects of translating and revising documents for an English-medium master of science in engineering programme in terms of workload and value for English for Specific Purposes (ESP) teacher development, integration, and enculturation. During the changeover from the diploma to bachelor-master…

  4. Suggesting a General ESP Model for Adult Learners

    Science.gov (United States)

    Al-Jumaily, Samir

    2011-01-01

    The study suggests a general model that could guarantee the cooperation between teachers and their students to overcome the difficulties encountered in ESP learning. It tries to join together different perspectives in the research of adult education, specifically in the teaching of English for Specific Purposes. It also provides some sort of trust…

  5. Between the ESP Classroom and the Workplace: Bridging the Gap

    Science.gov (United States)

    Bouzidi, Hassan

    2009-01-01

    Since the launch of far-reaching higher education reforms several years ago, many institutions across Morocco have begun revamping their English for Special Purposes (ESP) programs to bring them in line with the needs of local employers. These reforms recognize the correlation between what students learn in class and success in their future…

  6. EXPLORING THE MINDSETS OF ESP STUDENTS IN THE LIGHT ...

    African Journals Online (AJOL)

    This study aims at investigating the metaphors for language teachers ... and L2 reading achievement and the use of language learning strategies. At Iranian universities, English for Specific Purposes (ESP) courses are held ... Successful language learning and teaching calls for a full exploration of ... practices in particular.

  7. Dynamics of the spatial electron density distribution of EUV-induced plasmas

    Science.gov (United States)

    van der Horst, R. M.; Beckers, J.; Osorio, E. A.; Banine, V. Y.

    2015-11-01

    We studied the temporal evolution of the electron density distribution in a low pressure pulsed plasma induced by high energy extreme ultraviolet (EUV) photons using microwave cavity resonance spectroscopy (MCRS). In principle, MCRS only provides space averaged information about the electron density. However, we demonstrate here the possibility to obtain spatial information by combining multiple resonant modes. It is shown that EUV-induced plasmas, albeit being a rather exotic plasma, can be explained by known plasma physical laws and processes. Two stages of plasma behaviour are observed: first the electron density distribution contracts, after which it expands. It is shown that the contraction is due to cooling of the electrons. The moment when the density distribution starts to expand is related to the inertia of the ions. After tens of microseconds, the electrons reached the wall of the cavity. The speed of this expansion is dependent on the gas pressure and can be divided into two regimes. It is shown that the acoustic dominated regime the expansion speed is independent of the gas pressure and that in the diffusion dominated regime the expansion depends reciprocal on the gas pressure.

  8. Understanding EUV resist mottling leading to better resolution and linewidth roughness

    Science.gov (United States)

    Thackeray, James; Cameron, James; Jain, Vipul; LaBeaume, Paul; Coley, Suzanne; Ongayi, Owendi; Wagner, Mike; Biafore, John; Chun, Jun Sung

    2014-04-01

    We have shown that the dissolution properties can be successfully modified to improve the line/space profile and LWR of a low diffusion EUV CA resist. The surface roughness is a function of hot spots in the nominally unexposed regions of the resist material. We conjecture that the photoacid hot spots are formed due to DC flare present in the optical train of the exposure system. We also have shown that the PAGs can be further improved for out-of-band radiation (OOB) response. The improvement can be as much as 557% for 193nm exposure, and 838% by 248nm exposure. The improved OOB response leads to better contact hole performance. We also shared our continued improvement in resist witness plate performance with the majority of our resists passing for carbon growth, and all samples passing for non-cleanables. There does appear to be a site-to-site bias which we attribute to differences between e-beam and EUV exposure and/or substrate working distance from the source. Lastly, we show outstanding lithographic process window for 24 nm contact arrays on an NXE 3300 stepper as well as 15 nm half pitch lines and spaces on the PSI interferometric tool.

  9. Patterning with metal-oxide EUV photoresist: patterning capability, resist smoothing, trimming, and selective stripping

    Science.gov (United States)

    Mao, Ming; Lazzarino, Frederic; De Schepper, Peter; De Simone, Danilo; Piumi, Daniele; Luong, Vinh; Yamashita, Fumiko; Kocsis, Michael; Kumar, Kaushik

    2017-03-01

    Inpria metal-oxide photoresist (PR) serves as a thin spin-on patternable hard mask for EUV lithography. Compared to traditional organic photoresists, the ultrathin metal-oxide photoresist ( 12nm after development) effectively mitigates pattern collapse. Because of the high etch resistance of the metal-oxide resist, this may open up significant scope for more aggressive etches, new chemistries, and novel integration schemes. We have previously shown that metal-oxide PR can be successfully used to pattern the block layer for the imec 7-nm technology node[1] and advantageously replace a multiple patterning approach, which significantly reduces the process complexity and effectively decreases the cost. We also demonstrated the formation of 16nm half pitch 1:1 line/space with EUV single print[2], which corresponds to a metal 2 layer for the imec 7-nm technology node. In this paper, we investigate the feasibility of using Inpria's metal-oxide PR for 16nm line/space patterning. In meanwhile, we also explore the different etch process for LWR smoothing, resist trimming and resist stripping.

  10. EUV-induced oxidation of carbon on TiO2

    Science.gov (United States)

    Faradzhev, Nadir S.; Hill, Shannon B.

    2016-10-01

    Previously we reported estimates of the maximum etch rates of C on TiO2 by oxidizers including NO, O3 and H2O2 when irradiated by a spatially-non-uniform beam of extreme ultraviolet (EUV) radiation at 13.5 nm (Faradzhev et al., 2013 [6]). Here we extend that work by presenting temporally and spatially resolved measurements of the C etching by these oxidizers as a function of EUV intensity in the range (0.3 to 3) mW/mm2 [(0.2 to 2) × 10 [16] photons s- 1 cm- 2]. We find that the rates for NO scale linearly with intensity and are smaller than those for O3, which exhibit a weak, sub-linear intensity dependence in this range. We demonstrate that these behaviors are consistent with adsorption of the oxidizing precursor on the C surface followed by a photon-stimulated reaction resulting in volatile C-containing products. The kinetics of photon-induced C etching by hydrogen peroxide, however, appear to be more complex. The spatially resolved measurements reveal that C removal by H2O2 begins at the edges of the C spot, where the light intensity is the lowest, and proceeds toward the center of the spot. This localization of the reaction may occur because hydroxyl radicals are produced efficiently on the catalytically active TiO2 surface.

  11. EUV FLICKERING OF SOLAR CORONAL LOOPS: A NEW DIAGNOSTIC OF CORONAL HEATING

    Energy Technology Data Exchange (ETDEWEB)

    Tajfirouze, E.; Reale, F.; Peres, G. [Dipartimento di Fisica e Chimica, Università di Palermo, Piazza del Parlamento 1, I-90134 (Italy); Testa, P., E-mail: reale@astropa.unipa.it [Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA 02138 (United States)

    2016-02-01

    A previous work of ours found the best agreement between EUV light curves observed in an active region core (with evidence of super-hot plasma) and those predicted from a model with a random combination of many pulse-heated strands with a power-law energy distribution. We extend that work by including spatially resolved strand modeling and by studying the evolution of emission along the loops in the EUV 94 Å and 335 Å channels of the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory. Using the best parameters of the previous work as the input of the present one, we find that the amplitude of the random fluctuations driven by the random heat pulses increases from the bottom to the top of the loop in the 94 Å channel and from the top to the bottom in the 335 Å channel. This prediction is confirmed by the observation of a set of aligned neighboring pixels along a bright arc of an active region core. Maps of pixel fluctuations may therefore provide easy diagnostics of nanoflaring regions.

  12. Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography

    Science.gov (United States)

    Singh, Vikram; Satyanarayana, Vardhineedi Sri Venkata; Batina, Nikola; Reyes, Israel Morales; Sharma, Satinder K.; Kessler, Felipe; Scheffer, Francine R.; Weibel, Daniel E.; Ghosh, Subrata; Gonsalves, Kenneth E.

    2014-10-01

    Although extreme ultraviolet (EUV) lithography is being considered as one of the most promising next-generation lithography techniques for patterning sub-20 nm features, the development of suitable EUV resists remains one of the main challenges confronting the semiconductor industry. The goal is to achieve sub-20 nm line patterns having low line edge roughness (LER) of <1.8 nm and a sensitivity of 5 to 20 mJ/cm2. The present work demonstrates the lithographic performance of two nonchemically amplified (n-CARs) negative photoresists, MAPDST homopolymer and MAPDST-MMA copolymer, prepared from suitable monomers containing the radiation sensitive sulfonium functionality. Investigations into the effect of several process parameters are reported. These include spinning conditions to obtain film thicknesses <50 nm, baking regimes, exposure conditions, and the resulting surface topographies. The effect of these protocols on sensitivity, contrast, and resolution has been assessed for the optimization of 20 nm features and the corresponding LER/line width roughness. These n-CARs have also been found to possess high etch resistance. The etch durability of MAPDST homopolymer and MAPDST-MMA copolymer (under SF6 plasma chemistry) with respect to the silicon substrate are 7.2∶1 and 8.3∶1, respectively. This methodical investigation will provide guidance in designing new resist materials with improved efficiency for EUVL through polymer microstructure engineering.

  13. Difference in EUV photoresist design towards reduction of LWR and LCDU

    Science.gov (United States)

    Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert

    2017-03-01

    Pattern fidelity of EUV lithography is crucial for high resolution features, since small variation can affect device performance and even cause short or open circuit. For 1D features, dense lines and contact holes are the most common features for active, metal and contact layer, therefore line width roughness (LWR) and local critical dimension uniformity (LCDU) are important indexes to monitor. Both LWR and LCDU are greatly influenced by photon and acid shot noise. In addition, LWR is also affected by resist mechanical properties, like pattern collapse. In this study, we studied the influence of different chemically amplified resist components, such as polymer, PAG and quencher for both types and concentrations in order to understand the relative extent of influences of deprotection, acid diffusion, and base neutralization on pattern fidelity. However, conventional methods to approach higher resolution or low LWR/LCDU by sacrificing the dose are not sustainable. In order to continue to improve resist performance, a new component, metal salt sensitizer, is introduced into the resist system. This metal salt is able to achieve 30% dose reduction by increasing EUV absorption, maintaining LWR. We believe metal sensitizer might give us a new way to challenge the RLS trade-off.

  14. EUV secondary electron blur at the 22nm half pitch node

    Science.gov (United States)

    Gronheid, Roel; Younkin, Todd R.; Leeson, Michael J.; Fonseca, Carlos; Hooge, Joshua S.; Nafus, Kathleen; Biafore, John J.; Smith, Mark D.

    2011-04-01

    In this paper the Arrhenius behavior of blur upon EUV exposure is investigated through variation of the PEB temperature. In this way, thermally activated parameters that contribute to blur (such as acid/base diffusion) can be separated from non-thermally activated parameters (such as secondary electron blur). The experimental results are analyzed in detail using multi-wavelength resist modeling based on the continuum approach and through fitting of the EUV data using stochastic resist models. The extracted blur kinetics display perfectly linear Arrhenius behavior, indicating that there is no sign for secondary electron blur at 22nm half pitch. At the lowest PEB setting the total blur length is ~4nm, indicating that secondary electron blur should be well below that. The stochastic resist model gives a best fit to the current data set with parameters that result in a maximum probability of acid generation at 2.4nm from the photon absorption site. Extrapolation of the model predicts that towards the 16nm half pitch the impact on sizing dose is minimal and an acceptable exposure latitude is achievable. In order to limit the impact on line width roughness at these dimensions it will be required to control acid diffusion to ~5nm.

  15. eBeam initiative survey reports confidence in EUV and multi-beam technology

    Science.gov (United States)

    Fujimura, Aki; Willis, Jan

    2017-07-01

    A record 73 industry luminaries representing more than 30 different companies from across the semiconductor ecosystem participated in the 2016 eBeam Initiative perceptions survey. The eBeam Initiative also completed its second annual mask makers' survey with feedback from 10 captive and merchant photomask manufacturers. Among the results of the members' perception survey, respondents remained optimistic in the implementation of EUV lithography for semiconductor high-volume manufacturing (HVM), with confidence in EUV increasing over other next-generation lithography (NGL) techniques compared with last year's survey. In addition, expectations on the use of multi-beam technology for advanced photomask HVM by the end of 2018 continue to remain strong. Results from the eBeam Initiative's second annual mask makers' survey indicate several surprising trends on mask making related to write times, turn-around time (TAT) for mask manufacturing, resists, mask yields and other critical issues. The author will review the key findings and offer his viewpoint on their significance.

  16. Studying secondary electron behavior in EUV resists using experimentation and modeling

    Science.gov (United States)

    Narasimhan, Amrit; Grzeskowiak, Steven; Srivats, Bharath; Herbol, Henry; Wisehart, Liam; Kelly, Chris; Earley, William; Ocola, Leonidas E.; Neisser, Mark; Denbeaux, Gregory; Brainard, Robert L.

    2015-03-01

    EUV photons expose photoresists by complex interactions starting with photoionization that create primary electrons (~80 eV), followed by ionization steps that create secondary electrons (10-60 eV). Ultimately, these lower energy electrons interact with specific molecules in the resist that cause the chemical reactions which are responsible for changes in solubility. The mechanisms by which these electrons interact with resist components are key to optimizing the performance of EUV resists. An electron exposure chamber was built to probe the behavior of electrons within photoresists. Upon exposure and development of a photoresist to an electron gun, ellipsometry was used to identify the dependence of electron penetration depth and number of reactions on dose and energy. Additionally, our group has updated a robust software that uses first-principles based Monte Carlo model called "LESiS", to track secondary electron production, penetration depth, and reaction mechanisms within materials-defined environments. LESiS was used to model the thickness loss experiments to validate its performance with respect to simulated electron penetration depths to inform future modeling work.

  17. High-resolution and large-area nanoparticle arrays using EUV interference lithography.

    Science.gov (United States)

    Karim, Waiz; Tschupp, Simon Andreas; Oezaslan, Mehtap; Schmidt, Thomas J; Gobrecht, Jens; van Bokhoven, Jeroen A; Ekinci, Yasin

    2015-04-28

    Well-defined model systems are needed for better understanding of the relationship between optical, electronic, magnetic, and catalytic properties of nanoparticles and their structure. Chemical synthesis of metal nanoparticles results in large size and shape dispersion and lack of lateral order. In contrast, conventional top-down lithography techniques provide control over the lateral order and dimensions. However, they are either limited in resolution or have low throughput and therefore do not enable the large patterning area needed to obtain good signal-to-noise ratio in common analytical and characterization techniques. Extreme ultraviolet (EUV) lithography has the throughput and simplicity advantages of photolithography as well as high resolution due to its wavelength. Using EUV achromatic Talbot lithography, we have obtained 15 nm particle arrays with a periodicity of about 100 nm over an area of several square centimeters with high-throughput enabling the use of nanotechnology for fabrication of model systems to study large ensembles of well-defined identical nanoparticles with a density of 10(10) particles cm(-2).

  18. Quantification of dsDNA using the Hitachi F-7000 Fluorescence Spectrophotometer and PicoGreen dye.

    Science.gov (United States)

    Moreno, Luis A; Cox, Kendra L

    2010-11-05

    Quantification of DNA, especially in small concentrations, is an important task with a wide range of biological applications including standard molecular biology assays such as synthesis and purification of DNA, diagnostic applications such as quantification of DNA amplification products, and detection of DNA molecules in drug preparations. During this video we will demonstrate the capability of the Hitachi F-7000 Fluorescence Spectrophotometer equipped with a Micro Plate Reader accessory to perform dsDNA quantification using Molecular Probes Quant-it PicoGreen dye reagent kit. The F-7000 Fluorescence Spectrophotometer offers high sensitivity and high speed measurements. It is a highly flexible system capable of measuring fluorescence, luminescence, and phosphorescence. Several measuring modes are available, including wavelength scan, time scan, photometry and 3-D scan measurement. The spectrophotometer has sensitivity in the range of 50 picomoles of fluorescein when using a 300 μL sample volume in the microplate, and is capable of measuring scan speeds of 60,000 nm/minute. It also has a wide dynamic range of up to 5 orders of magnitude which allows for the use of calibration curves over a wide range of concentrations. The optical system uses all reflective optics for maximum energy and sensitivity. The standard wavelength range is 200 to 750 nm, and can be extended to 900 nm when using one of the optional near infrared photomultipliers. The system allows optional temperature control for the plate reader from 5 to 60 degrees Celsius using an optional external temperature controlled liquid circulator. The microplate reader allows for the use of 96 well microplates, and the measuring speed for 96 wells is less than 60 seconds when using the kinetics mode. Software controls for the F-7000 and Microplate Reader are also highly flexible. Samples may be set in either column or row formats, and any combination of wells may be chosen for sample measurements. This allows

  19. A Functional-Notional Approach for English for Specific Purposes (ESP) Programs.

    Science.gov (United States)

    Kim, Young-Min

    English for Specific Purposes (ESP) programs, characterized by the special needs of the language learners, are described and a review of the literature on a functional-notional approach to the syllabus design of ESP programs is presented. It is suggested that effective ESP programs should teach the language skills necessary to function and perform…

  20. Evaluation of an ESP Medical Textbook: Instructors and Learners' Perceptions in Focus

    Science.gov (United States)

    Salehi, Hadi; Khadivar, Zahra; Mehrabi, Mahmood

    2015-01-01

    Evaluation is basically a matching process, which concerns matching learners' needs to available solutions. Through analysis and assessment of ESP textbooks, a much more promising and desirable approach to a theory of ESP takes place. To this aim, the purpose of the present study was to evaluate the ESP medical textbook. To gather the necessary…

  1. A New High-sensitivity solar X-ray Spectrophotometer SphinX:early operations and databases

    Science.gov (United States)

    Gburek, Szymon; Sylwester, Janusz; Kowalinski, Miroslaw; Siarkowski, Marek; Bakala, Jaroslaw; Podgorski, Piotr; Trzebinski, Witold; Plocieniak, Stefan; Kordylewski, Zbigniew; Kuzin, Sergey; Farnik, Frantisek; Reale, Fabio

    The Solar Photometer in X-rays (SphinX) is an instrument operating aboard Russian CORONAS-Photon satellite. A short description of this unique instrument will be presented and its unique capabilities discussed. SphinX is presently the most sensitive solar X-ray spectrophotometer measuring solar spectra in the energy range above 1 keV. A large archive of SphinX mea-surements has already been collected. General access to these measurements is possible. The SphinX data repositories contain lightcurves, spectra, and photon arrival time measurements. The SphinX data cover nearly continuously the period since the satellite launch on January 30, 2009 up to the end-of November 2009. Present instrument status, data formats and data access methods will be shown. An overview of possible new science coming from SphinX data analysis will be discussed.

  2. Signal-to-noise optimization and evaluation of a home-made visible diode-array spectrophotometer

    Science.gov (United States)

    Raimundo, Jr., Ivo M.; Pasquini, Celio

    1993-01-01

    This paper describes a simple low-cost multichannel visible spectrophotometer built with an RL512G EGG-Reticon photodiode array. A symmetric Czerny-Turner optical design was employed; instrument control was via a single-board microcomputer based on the 8085 Intel microprocessor. Spectral intensity data are stored in the single-board's RAM and then transferred to an IBM-AT 3865X compatible microcomputer through a RS-232C interface. This external microcomputer processes the data to recover transmittance, absorbance or relative intensity of the spectra. The signal-to-noise ratio and dynamic range were improved by using variable integration times, which increase during the same scan; and by the use of either weighted or unweighted sliding average of consecutive diodes. The instrument is suitable for automatic methods requiring quasi-simultaneous multiwavelength detections, such as multivariative calibration and flow-injection gradient scan techniques. PMID:18924979

  3. Intercomparison of total column ozone data from the Pandora spectrophotometer with Dobson, Brewer, and OMI measurements over Seoul, Korea

    Directory of Open Access Journals (Sweden)

    J. Kim

    2017-10-01

    Full Text Available Daily total column ozone (TCO measured using the Pandora spectrophotometer (no. 19 was compared with data from the Dobson (no. 124 and Brewer (no. 148 spectrophotometers, as well as from the Ozone Monitoring Instrument (OMI (with two different algorithms, Total Ozone Mapping Spectrometer (TOMS TOMS and differential optical absorption spectroscopy (DOAS methods, over the 2-year period between March 2012 and March 2014 at Yonsei University, Seoul, Korea. Based on the linear-regression method, the TCO from Pandora is closely correlated with those from other instruments with regression coefficients (slopes of 0.95 (Dobson, 1.00 (Brewer, 0.98 (OMI-TOMS, and 0.97 (OMI-DOAS, and determination coefficients (R2 of 0.95 (Dobson, 0.97 (Brewer, 0.96 (OMI-TOMS, and 0.95 (OMI-DOAS. The daily averaged TCO from Pandora has within 3 % differences compared to TCO values from other instruments. For the Dobson measurements in particular, the difference caused by the inconsistency in observation times when compared with the Pandora measurements was up to 12.5 % because of diurnal variations in the TCO values. However, the comparison with Brewer after matching the observation time shows agreement with large R2 and small biases. The TCO ratio between Brewer and Pandora shows the 0.98 ± 0.03, and the distributions for relative differences between two instruments are 89.2 and 57.1 % of the total data within the error ranges of 3 and 5 %, respectively. The TCO ratio between Brewer and Pandora also is partially dependent on solar zenith angle. The error dependence by the observation geometry is essential to the further analysis focusing on the sensitivity of aerosol and the stray-light effect in the instruments.

  4. Intercomparison of total column ozone data from the Pandora spectrophotometer with Dobson, Brewer, and OMI measurements over Seoul, Korea

    Science.gov (United States)

    Kim, Jiyoung; Kim, Jhoon; Cho, Hi-Ku; Herman, Jay; Park, Sang Seo; Lim, Hyun Kwang; Kim, Jae-Hwan; Miyagawa, Koji; Lee, Yun Gon

    2017-10-01

    Daily total column ozone (TCO) measured using the Pandora spectrophotometer (no. 19) was compared with data from the Dobson (no. 124) and Brewer (no. 148) spectrophotometers, as well as from the Ozone Monitoring Instrument (OMI) (with two different algorithms, Total Ozone Mapping Spectrometer (TOMS) TOMS and differential optical absorption spectroscopy (DOAS) methods), over the 2-year period between March 2012 and March 2014 at Yonsei University, Seoul, Korea. Based on the linear-regression method, the TCO from Pandora is closely correlated with those from other instruments with regression coefficients (slopes) of 0.95 (Dobson), 1.00 (Brewer), 0.98 (OMI-TOMS), and 0.97 (OMI-DOAS), and determination coefficients (R2) of 0.95 (Dobson), 0.97 (Brewer), 0.96 (OMI-TOMS), and 0.95 (OMI-DOAS). The daily averaged TCO from Pandora has within 3 % differences compared to TCO values from other instruments. For the Dobson measurements in particular, the difference caused by the inconsistency in observation times when compared with the Pandora measurements was up to 12.5 % because of diurnal variations in the TCO values. However, the comparison with Brewer after matching the observation time shows agreement with large R2 and small biases. The TCO ratio between Brewer and Pandora shows the 0.98 ± 0.03, and the distributions for relative differences between two instruments are 89.2 and 57.1 % of the total data within the error ranges of 3 and 5 %, respectively. The TCO ratio between Brewer and Pandora also is partially dependent on solar zenith angle. The error dependence by the observation geometry is essential to the further analysis focusing on the sensitivity of aerosol and the stray-light effect in the instruments.

  5. Concentration Determination of Nucleic Acids and Proteins Using the Micro-volume Bio-spec Nano Spectrophotometer

    Science.gov (United States)

    Sukumaran, Suja

    2011-01-01

    Nucleic Acid quantitation procedures have advanced significantly in the last three decades. More and more, molecular biologists require consistent small-volume analysis of nucleic acid samples for their experiments. The BioSpec-nano provides a potential solution to the problems of inaccurate, non-reproducible results, inherent in current DNA quantitation methods, via specialized optics and a sensitive PDA detector. The BioSpec-nano also has automated functionality such that mounting, measurement, and cleaning are done by the instrument, thereby eliminating tedious, repetitive, and inconsistent placement of the fiber optic element and manual cleaning. In this study, data is presented on the quantification of DNA and protein, as well as on measurement reproducibility and accuracy. Automated sample contact and rapid scanning allows measurement in three seconds, resulting in excellent throughput. Data analysis is carried out using the built-in features of the software. The formula used for calculating DNA concentration is: Sample Concentration = DF · (OD260-OD320)· NACF (1) Where DF = sample dilution factor and NACF = nucleic acid concentration factor. The Nucleic Acid concentration factor is set in accordance with the analyte selected1. Protein concentration results can be expressed as μg/ mL or as moles/L by entering e280 and molecular weight values respectively. When residue values for Tyr, Trp and Cysteine (S-S bond) are entered in the e280Calc tab, the extinction coefficient values are calculated as e280 = 5500 x (Trp residues) + 1490 x (Tyr residues) + 125 x (cysteine S-S bond). The e280 value is used by the software for concentration calculation. In addition to concentration determination of nucleic acids and protein, the BioSpec-nano can be used as an ultra micro-volume spectrophotometer for many other analytes or as a standard spectrophotometer using 5 mm pathlength cells. PMID:21372788

  6. An in vitro comparison of quantitative light-induced fluorescence-digital and spectrophotometer on monitoring artificial white spot lesions.

    Science.gov (United States)

    Kim, Hee Eun; Kim, Baek-Il

    2015-09-01

    The aim of this study was to evaluate the efficacy of quantitative light-induced fluorescence-digital (QLF-D) compared to a spectrophotometer in monitoring progression of enamel lesions. To generate artificial caries with various severities of lesion depths, twenty bovine specimens were immersed in demineralizing solution for 40 days. During the production of the lesions, repeat measurements of fluorescence loss (ΔF) and color change (ΔE) were performed in six distinct stages after the demineralization of the specimens: after 3, 5, 10, 20, 30, and 40 days of exposure to the demineralizing solution. Changes in the ΔF values in the lesions were analyzed using the QLF-D, and changes in the ΔE values in lesions were analyzed using a spectrophotometer. The repeated measures ANOVA of ΔF and ΔE values were used to determine whether there are significant differences at different exposure times in the demineralizing solution. Spearman's rank correlation coefficient was analyzed between ΔF and ΔE. The ΔF values significantly decreased based on the demineralizing period (p<0.001). Relatively large changes in ΔF values were observed during the first 10 days. There were significant changes in L(*), a(*), b(*), and ΔE values in lesions with increasing demineralizing duration (p<0.001). A strong correlation was observed between ΔF and ΔE with p=-0.853 (p<0.001). The results support the efficacy of QLF-D in monitoring color changes. Our findings demonstrate that QLF-D are a more efficient and stable tool for early caries detection. Copyright © 2015 Elsevier B.V. All rights reserved.

  7. Concentration determination of nucleic acids and proteins using the micro-volume BioSpec-nano-spectrophotometer.

    Science.gov (United States)

    Sukumaran, Suja

    2011-02-17

    Nucleic acid quantitation procedures have advanced significantly in the last three decades. More and more, molecular biologists require consistent small-volume analysis of nucleic acid samples for their experiments. The BioSpec-nano provides a potential solution to the problems of inaccurate, non-reproducible results, inherent in current DNA quantitation methods, via specialized optics and a sensitive PDA detector. The BioSpec-nano also has automated functionality such that mounting, measurement, and cleaning are done by the instrument, thereby eliminating tedious, repetitive, and inconsistent placement of the fiber optic element and manual cleaning. In this study, data is presented on the quantification of DNA and protein, as well as on measurement reproducibility and accuracy. Automated sample contact and rapid scanning allows measurement in three seconds, resulting in excellent throughput. Data analysis is carried out using the built-in features of the software. The formula used for calculating DNA concentration is: Sample Concentration = DF · (OD260-OD320)· NACF (1) Where DF = sample dilution factor and NACF = nucleic acid concentration factor. The Nucleic Acid concentration factor is set in accordance with the analyte selected. Protein concentration results can be expressed as μg/mL or as moles/L by entering e280 and molecular weight values respectively. When residue values for Tyr, Trp and Cysteine (S-S bond) are entered in the e280Calc tab, the extinction coefficient values are calculated as e280 = 5500 x (Trp residues) + 1490 x (Tyr residues) + 125 x (cysteine S-S bond). The e280 value is used by the software for concentration calculation. In addition to concentration determination of nucleic acids and protein, the BioSpec-nano can be used as an ultra micro-volume spectrophotometer for many other analytes or as a standard spectrophotometer using 5 mm pathlength cells.

  8. Spectrophotometer is useful for assessing vitiligo and chemical leukoderma severity by quantifying color difference with surrounding normally pigmented skin.

    Science.gov (United States)

    Hayashi, M; Okamura, K; Araki, Y; Suzuki, M; Tanaka, T; Abe, Y; Nakano, S; Yoshizawa, J; Hozumi, Y; Inoie, M; Suzuki, T

    2017-10-22

    Acquired skin hypopigmentation has many etiologies, including autoimmune melanocyte destruction, skin aging, inflammation, and chemical exposure. Distinguishing lesions from normally pigmented skin is clinically important to precisely assess disease severity. However, no gold standard assessment method has been reported. We aimed to investigate whether spectrophotometers are useful for assessing vitiligo and rhododendrol (4-(4-hydroxyphenol)-2-butanol) (Rhododenol® )-induced leukoderma disease severity by quantifying skin color. Mexameter® MX18 and CM-700d spectrophotometer were used for assessing vitiligo/leukoderma by measuring melanin index, L*a*b* color space, and ΔE*ab value, which represents the color difference between two subjects and is calculated by the values of L*a*b*. MX18 and CM-700d can quantitatively distinguish vitiligo/leukoderma from normally pigmented skin based on melanin index. CM-700d consistently quantified the color of vitiligo/leukoderma lesions and surrounding normally pigmented skin in L*a*b* color spaces and ΔE*ab. ΔE*ab is well correlated with melanin index and clinical appearance. ΔE*ab has been frequently used in aesthetic dentistry; however, current study is the first to use it in the measurement of skin color. ΔE*ab seems to be a useful parameter to evaluate the color contrast between vitiligo/leukoderma and surrounding normally pigmented skin and can be used to evaluate disease severity and patient's quality of life. © 2017 John Wiley & Sons A/S. Published by John Wiley & Sons Ltd.

  9. Espécies novas de Tomosvaryella Aczél (Diptera, Pipunculidae da Argentina e chave para as espécies Sul-americanas

    Directory of Open Access Journals (Sweden)

    Rosaly Ale-Rocha

    2011-09-01

    Full Text Available Duas espécies novas de Tomosvaryella Aczél são descritas para a Argentina, Tomosvaryella lobata sp. nov. e Tomosvaryella platypoda sp. nov.; uma chave de identificação para as espécies sul-americanas de Tomosvaryella é apresentada e são fornecidos registros novos de espécies de Tomosvaryella para o Brasil e Argentina.

  10. Extraction of Active Regions and Coronal Holes from EUV Images Using the Unsupervised Segmentation Method in the Bayesian Framework

    Science.gov (United States)

    Arish, S.; Javaherian, M.; Safari, H.; Amiri, A.

    2016-04-01

    The solar corona is the origin of very dynamic events that are mostly produced in active regions (AR) and coronal holes (CH). The exact location of these large-scale features can be determined by applying image-processing approaches to extreme-ultraviolet (EUV) data.

  11. Adaptive Optics to Counteract Thermal Aberrations : System Design for EUV-Lithography with Sub-nm Precision

    NARCIS (Netherlands)

    Saathof, R.

    2013-01-01

    In highly precise systems the thermal expansion of system-parts is of increasing concern, since it can severely compromise its performance at sub-nanometre level. An example of such a system is an Extreme UltraViolet (EUV)-lithography machine that is used in the semi-conductor industry to project

  12. Estimation of temporal evolution of the helium plasmasphere based on a sequence of IMAGE/EUV images

    Science.gov (United States)

    Nakano, S.; Fok, M.-C.; Brandt, P. C.; Higuchi, T.

    2014-05-01

    We have developed a technique for estimating the temporal evolution of the plasmaspheric helium ion density based on a sequence of extreme ultraviolet (EUV) data obtained from the IMAGE satellite. In the proposed technique, the estimation is obtained by incorporating EUV images from IMAGE into a two-dimensional fluid model of the plasmasphere using a data assimilation approach based on the ensemble transform Kalman filter. Since the motion and the spatial structure of the helium plasmasphere is strongly controlled by the electric field in the inner magnetosphere, the electric field around the plasmapause can also be estimated using the ensemble transform Kalman filter. We performed an experiment using synthetic images that were generated from the same numerical model under a certain condition. It was confirmed that the condition that generated the synthetic images was successfully reproduced. We also present some results obtained using real EUV imaging data. Finally, we discuss the possibility of estimating the density profile along a magnetic field line. Since each EUV image was taken from a different direction due to the motion of the IMAGE satellite, we could obtain the information on the density profile along a field line by combining multiple images.

  13. Design of a compact device to generate and test beams with orbital angular momentum in the EUV.

    Science.gov (United States)

    Pabon, D O; Ledesma, S A; Quinteiro, G F; Capeluto, M G

    2017-10-10

    We present a compact design to generate and test optical-vortex beams with possible applications in the extreme ultraviolet (EUV) region of the electromagnetic spectrum. The device consists of a diffractive mask where both the beam with orbital angular momentum and the reference wavefront to test its phase are generated. In order to show that the proposal would work in the EUV, simulations and proof-of-principle experiments were performed, using typical parameters for EUV holography scaled to visible wavelengths. As the simplest case, we consider the well-known Laguerre-Gaussian (LG)-like beams, which have a single vortex in the propagation axis. To further test the versatility of the device, we consider Mathieu beams, more complex structured beams that may contain several vortices. In the experiment, a spatial light modulator was used to display the mask. As examples, we show the results for a LG-like beam with topological charge ℓ=1 and Mathieu beams with topological charge ℓ=2 and ellipticity q=2. These results show the potential of the device to generate a variety of beam shapes at EUV wavelengths.

  14. Chemical Effect of Dry and Wet Cleaning of the Ru Protective Layer of the Extreme ultraviolet (EUV) Lithography Reflector

    Energy Technology Data Exchange (ETDEWEB)

    Belau, Leonid; Park, Jeong Y.; Liang, Ted; Seo, Hyungtak; Somorjai, Gabor A.

    2009-04-10

    The authors report the chemical influence of cleaning of the Ru capping layer on the extreme ultraviolet (EUV) reflector surface. The cleaning of EUV reflector to remove the contamination particles has two requirements: to prevent corrosion and etching of the reflector surface and to maintain the reflectivity functionality of the reflector after the corrosive cleaning processes. Two main approaches for EUV reflector cleaning, wet chemical treatments [sulfuric acid and hydrogen peroxide mixture (SPM), ozonated water, and ozonated hydrogen peroxide] and dry cleaning (oxygen plasma and UV/ozone treatment), were tested. The changes in surface morphology and roughness were characterized using scanning electron microscopy and atomic force microscopy, while the surface etching and change of oxidation states were probed with x-ray photoelectron spectroscopy. Significant surface oxidation of the Ru capping layer was observed after oxygen plasma and UV/ozone treatment, while the oxidation is unnoticeable after SPM treatment. Based on these surface studies, the authors found that SPM treatment exhibits the minimal corrosive interactions with Ru capping layer. They address the molecular mechanism of corrosive gas and liquid-phase chemical interaction with the surface of Ru capping layer on the EUV reflector.

  15. Ecotype dependent expression and alternative splicing of epithiospecifier protein (ESP) in Arabidopsis thaliana.

    Science.gov (United States)

    Kissen, R; Hyldbakk, E; Wang, C-W V; Sørmo, C G; Rossiter, J T; Bones, A M

    2012-03-01

    Epithiospecifier protein (ESP) is responsible for diverting glucosinolate hydrolysis from the generation of isothiocyanates to that of epithionitriles or nitriles, and thereby negatively affects the ability of the plant to defend itself against certain insects. Despite this important role of ESP, little is known about its expression in plant tissues and the regulation thereof. We therefore investigated ESP expression by qPCR and Western blot in different organs during the growth cycle of the two Arabidopsis thaliana ecotypes Col-0 and Mt-0. Besides the fact that ESP transcript and protein levels were revealed to be much higher in Mt-0 than in Col-0 in all cases, our qPCR results also indicated that ESP expression is regulated differently in the two A. thaliana ecotypes. No ESP protein was detected by Western blot in any organ or developmental stage for Col-0. During the assays an alternative splice variant of ESP was identified in Col-0, but not Mt-0, leading to a mis-spliced transcript which could explain the low expression levels of ESP in the former ecotype. Analysis of genomic sequences containing the ESP splice sites, of ESP protein level and ESP activity from seven A. thaliana ecotypes showed a positive correlation between the presence of a non-canonical 5' splice site for ESP and the absence of detectable ESP protein levels and ESP activity. When analysing the expression of both transcript variants in Col-0 after treatment with methyl jasmonate, a condition known to "induce ESP", it was indeed the alternative splice variant that was preferentially induced.

  16. Analysis of Ozone (O3 and Erythemal UV (EUV measured by TOMS in the equatorial African belt

    Directory of Open Access Journals (Sweden)

    Øyvind Frette

    2010-03-01

    Full Text Available We presented time series of total ozone column amounts (TOCAs and erythemal UV (EUV doses derived from measurements by TOMS (Total Ozone Mapping Spectrometer instruments on board the Nimbus-7 (N7 and the Earth Probe (EP satellites for three locations within the equatorial African belt for the period 1979 to 2000. The locations were Dar-es-Salaam (6.8° S, 39.26° E in Tanzania, Kampala (0.19° N, 32.34° E in Uganda, and Serrekunda (13.28° N, 16.34° W in Gambia. Equatorial Africa has high levels of UV radiation, and because ozone shields UV radiation from reaching the Earth’s surface, there is a need to monitor TOCAs and EUV doses. In this paper we investigated the trend of TOCAs and EUV doses, the effects of annual and solar cycles on TOCAs, as well as the link between lightning and ozone production in the equatorial African belt. We also compared clear-sky simulated EUV doses with the corresponding EUV doses derived from TOMS measurements. The TOCAs were found to vary in the ranges 243 DU − 289 DU, 231 DU − 286 DU, and 236 DU − 296 DU, with mean values of 266.9 DU, 260.9 DU, and 267.8 DU for Dar-es-Salaam, Kampala and Serrekunda, respectively. Daily TOCA time series indicated that Kampala had the lowest TOCA values, which we attributed to the altitude effect. There were two annual ozone peaks in Dar-es-Salaam and Kampala, and one annual ozone peak in Serrekunda. The yearly TOCA averages showed an oscillation within a five-year period. We also found that the EUV doses were stable at all three locations for the period 1979−2000, and that Kampala and Dar-es-Salaam were mostly cloudy throughout the year, whereas Serrekunda was mostly free from clouds. It was also found that clouds were among the major factors determining the level of EUV reaching the Earth´s surface. Finally, we noted that during rainy seasons, horizontal advection effects augmented by lightning activity may be responsible for enhanced ozone production in the tropics.

  17. Revisão das espécies neotropicais de Empididae (Diptera descritas por Mario Bezzi: VII. As espécies descritas em Hilara Meigen

    Directory of Open Access Journals (Sweden)

    José Albertino Rafael

    2011-09-01

    Full Text Available As cinco espécies descritas em Hilara por Mario Bezzi estão sendo redescritas e ilustradas. Atualmente três espécies permanecem em Hilara: H. irritans, H. perplexa e H. perturbans e duas espécies em Hilarigona: H. aberrans e H. abnormis. Todos os tipos primários foram examinados e estão sendo designados lectótipos para as três espécies de Hilara.

  18. Full-sun synchronic EUV and coronal hole mapping using multi-instrument images: Data and software made available

    Science.gov (United States)

    Caplan, R. M.; Downs, C.; Linker, J.

    2015-12-01

    A method for the automatic generation of EUV and coronal hole (CH) maps using simultaneous multi-instrument imaging data is described. Synchronized EUV images from STEREO/EUVI A&B 195Å and SDO/AIA 193Å undergo preprocessing steps that include PSF-deconvolution and the application of nonlinear data-derived intensity corrections that account for center-to-limb variations (limb-brightening) and inter-instrument intensity normalization. The latter two corrections are derived using a robust, systematic approach that takes advantage of unbiased long-term averages of data and serve to flatten the images by converting all pixel intensities to a unified disk center equivalent. While the number of applications are broad, we demonstrate how this technique is very useful for CH detection as it enables the use of a fast and simplified image segmentation algorithm to obtain consistent detection results. The multi-instrument nature of the technique also allows one to track evolving features consistently for longer periods than is possible with a single instrument, and preliminary results quantifying CH area and shape evolution are shown.Most importantly, several data and software products are made available to the community for use. For the ~4 year period of 6/10/2010 to 8/18/2014, we provide synchronic EUV and coronal hole maps at 6-hour cadence as well as the data-derived limb brightening and inter-instrument correction factors that we applied. We also make available a ready-to-use MATLAB script EUV2CHM used to generate the maps, which loads EUV images, applies our preprocessing steps, and then uses our GPU-accelerated/CPU-multithreaded segmentation algorithm EZSEG to detect coronal holes.

  19. Analysis, simulation, and experimental studies of YAG and CO2 laser-produced plasma for EUV lithography sources

    Science.gov (United States)

    Hassanein, A.; Sizyuk, V.; Harilal, S. S.; Sizyuk, T.

    2010-04-01

    Efficient laser systems are essential for the realization of high volume manufacturing in extreme ultraviolet lithography (EUVL). Solid-state Nd:YAG lasers usually have lower efficiency and source suppliers are alternatively investigating the use of high power CO2 laser systems. However, CO2 laser-produced plasmas (LPP) have specific characteristics and features that should be taken into account when considering them as the light source for EUVL. The analysis of recent experimental and theoretical work showed significant differences in the properties of plasma plumes produced by CO2 and the Nd:YAG lasers including EUV radiation emission, source formation, debris generation, and conversion efficiency. The much higher reflectivity of CO2 laser from liquid, vapor, and plasma of a tin target results in the production of optically thinner plumes with higher velocity and in a better formation of plasma properties (temperature and density values) towards more efficient EUV source. However, the spikes in the temporal profiles of current CO2 laser will additionally affect the properties of the produced plasma. We have developed unique combination of state-of-the-art experimental facilities (CMUXE Laboratory) and advanced computer simulation (HEIGHTS) package for studying and optimizing various lasers, discharge produced plasmas (DPP), and target parameters as well as the optical collection system regarding EUV lithography. In this work, detailed characteristics of plasmas produced by CO2 and Nd:YAG lasers were analyzed and compared both experimentally and theoretically for optimizing EUV from LPP sources. The details of lower overheating of plasma produced by CO2 laser are given with time and explain how to utilize the high reflectivity of such lasers in plasmas produced in different target geometries to significantly enhance the conversion efficiency of EUV radiation.

  20. The Impact of Mobile Learning on ESP Learners' Performance

    Directory of Open Access Journals (Sweden)

    Fahad Alkhezzi

    2016-07-01

    Full Text Available This study explores the impact of using mobile phone applications, namely Telegram Messenger, on teaching and learning English in an ESP context. The main objective is to test whether using mobile phone applications have an impact on ESP learners’ performance by mainly investigating the influence such teaching technique can have on learning vocabulary, and how this can affect the learner's’ ability to use grammar correctly and whether their writing skill is improved. The results showed that using mobile phone applications to teach a foreign language skill or subskill is fruitful and does impact learners’ comprehension of vocabulary and grammatical rules. The results specifically indicate that mobile phones can be used in many different ways to teach and learn technical and semi-technical vocabulary easily outside the classroom, however, to teach grammatical rules and writing it is recommended that certain strategies be used due to certain limitations.

  1. A Task-Based Language Teaching Approach in Teaching Esp

    Directory of Open Access Journals (Sweden)

    Regina Motuziene

    2013-08-01

    Full Text Available In the article the general overview of the popularity of EFL for university and college students in Lithuania is discussed paying attention to the peculiarities of teaching and learning English for Specific Purposes (ESP at Klaipeda State College and also the strategies of enhancing the communicative competence or ability to communicate both spoken or written language and developing four language skills. The article deals with EFL status in the present labour market in Lithuania as well as the problems the English language teachers and students face and gives the reasons for the need of applying task-based language teaching (TBLT approach used in teaching ESP for students of higher educational institutions.

  2. A PRACTICAL APPROACH TO THE METHODOLOGY OF ESP TEACHING

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    Carmen D. CARAIMAN

    2014-05-01

    Full Text Available The ability to master specialized terminology in English plays an ever increasing role in the selection of candidates for employment due to the internalization of the labour market and of the research activity exchanges. Subsequent to Romania’s joining the EU, the vacancies available on the European labour market, including in the academic area, represent the major factor that has determined an increase in the interest paid in the acquisition of specialized terminology. This interest is shared by trainees, trainers, authors of textbooks and ESP (English for Specific Purposes specialists. In the present paper, we intend to outline some of the main directions, methods and strategies that an ESP course should follow for providing high-quality and up-to-date information to the trainees interested in acquiring specialized vocabulary for their future workplaces. Finally, we intend to anticipate trends that the evolution of specialized foreign language teaching methodology will follow in the near future.

  3. Anti-parallel filament flows and bright dots observed in the EUV with Hi-C

    Science.gov (United States)

    Alexander, C. E.; Regnier, S.; Walsh, R. W.; Winebarger, A. R.; Cirtain, J. W.

    2013-12-01

    The Hi-C instrument imaged the million degree corona at the highest spatial and temporal resolution to date. The instrument imaged a complicated active region which contained several interesting features. Scientists at UCLan in the UK, in collaboration with other members of the Hi-C science team, studied two of these festures: anti-parallel filament flows and bright EUV dots. Plasma flows within prominences/filaments have been observed for many years and hold valuable clues concerning the mass and energy balance within these structures. Evidence of ';counter-steaming' flows has previously been inferred from these cool plasma observations but now, for the first time, these flows have been directly imaged along fundamental filament threads within the million degree corona (at 193 Å). We present observations of an active region filament observed with Hi-C that exhibits anti-parallel flows along adjacent filament threads. The ultra-high spatial and temporal resolution of Hi-C allow the anti-parallel flow velocities to be measured (70 - 80 km/s) and gives an indication of the resolvable thickness of the individual strands (0.8' × 0.1'). The temperature distribution of the plasma flows was estimated to be log T(K) = 5.45 × 0.10 using EM loci analysis. Short-lived, small brightenings sparkling at the edge of the active region, calle EUV Bright Dots (EBDs) were also investigated. EBDs have a characteristic duration of 25 s with a characteristic length of 680 km. These brightenings are not fully resolved by the SDO/AIA instrument at the same wavelength, but can however be identified with respect to the Hi-C location of the EBDs. In addition, EBDs are seen in other chromospheric/coronal channels of SDO/AIA suggesting a temperature between 0.5 and 1.5 MK. Based on a potential field extrapolation from an SDO/HMI magnetogram, the EBDs appear at the footpoints of large-scale trans-equatorial coronal loops. The Hi-C observations provide the first evidence of small-scale EUV

  4. Enhancing EUV mask blanks usability through smart shift and blank-design pairing optimization

    Science.gov (United States)

    Soni, Rakesh Kumar; Paninjath, Sankaranarayanan; Pereira, Mark; Buck, Peter; Thwaite, Peter

    2016-10-01

    EUV Defect avoidance techniques will play a vital role in extreme ultraviolet lithography (EUVL) photomask fabrication with the anticipation that defect free mask blanks won't be available and that cost effective techniques will not be available for defect repairing. In addition, mask shops may not have a large inventory of expensive EUV mask blanks. Given these facts, defect avoidance can be used as cost effective technique to optimize the mask blank and design data (mask data) pair selection across mask blank manufacturers and mask shops so that overall mask blank utilization can be enhanced. In previous work, it was determined that the pattern shift based solution increases the chance that a defective mask blank can be used that would otherwise be discarded [1]. In pattern shift, design data is shifted such that defects are either moved to isolated regions or hidden under the patterns that are written. However pattern shifts techniques don't perform well with masks with higher defect counts. Pattern shift techniques in this form assume all defects to be equally critical. In addition, a defect is critical or important only if it lands on the main pattern. A defect landing on fill, sub-resolution assist feature (SRAF) or fiducial areas may not be critical. In this paper we assess the performance of pattern shift techniques assuming defects that are not critical based upon size or type, as well as defects landing in non-critical areas (smart shift) can be ignored. In a production mask manufacturing environment it is necessary to co-optimize and prioritize blank-design pairing for multiple mask layouts in the queue with the available blanks. A blank-design pairing tool maximizes the utilization of blanks by finding the best pairing between blanks and design data so that the maximum number of mask blanks can be used. In this paper we also propose a novel process which would optimize the usage of costly EUV mask blanks across mask blank manufacturers and mask shops

  5. Nouvelle espèce des Syntomides (Lepidoptera Heterocera)

    NARCIS (Netherlands)

    Snellen, P.C.T.

    1886-01-01

    Quatre mâles frais et bien conservés de 58—64 millim. d’envergure. Cette nouvelle espèce, gigantesque pour une Syntomide, appartient au genre Automolis, tel qu’il a été défini par Herrich-Schäffer, dans son ouvrage »Sammlung aussereuropäischer Schmetterlinge” (p. 21); le nom est emprunté au bien

  6. Authenticity in the Context of Technologically Enriched ESP

    Directory of Open Access Journals (Sweden)

    Vilhelmina Vaičiūnienė

    2013-01-01

    Full Text Available Purpose—to determine student attitudes towards authenticity and the interrelation between authenticity and the use of ICT in the ESP learning context. Design/methodology/approach—the research conducted in autumn 2011 was aimed at comparative analysis of students of two study modes—full-time and part-time. It followed research focusing on Bachelor study programme student attitudes (Business Informatics and Finance Economics to authentic resources carried out in spring of 2010. The survey participants were Bachelor study cycle first year students from several faculties of MRU (Law, Politics and Management, Economics and Finance Management, Social Informatics, Social Policy. The paper discusses the ESP learning experience at Mykolas Romeris University and presents research findings obtained through the questionnaire survey. Findings—comparative analysis between full-time and part-time study mode student responses reveals similar learning patterns; however, certain differences can also be observed. The full-time students are motivated by more advanced authentic learning materials and they are more computer literate and able to access these materials, whereas the respondents from the part-time study mode appreciate more traditional Internet-based language learning tools. Research limitations/implications—the research sample was composed of first year Bachelor study programme students, therefore the results cannot be generalised and applied to Master level students. Practical implications—awareness of student needs and problems encountered in authentic learning environment may help improve ESP teaching methods. Originality/Value—gaining insight into student perception of authenticity in learning process and technological proficiency to access authentic resources Keywords: authenticity, student autonomy, ESP context, information communication technologies (ICT. Research type: research paper.

  7. Authenticity in the Context of Technologically Enriched ESP

    Directory of Open Access Journals (Sweden)

    Vilhelmina Vaičiūnienė

    2012-07-01

    Full Text Available Purpose—to determine student attitudes towards authenticity and the interrelation between authenticity and the use of ICT in the ESP learning context.Design/methodology/approach—the research conducted in autumn 2011 was aimed at comparative analysis of students of two study modes—full-time and part-time. It followed research focusing on Bachelor study programme student attitudes (Business Informatics and Finance Economics to authentic resources carried out in spring of 2010. The survey participants were Bachelor study cycle first year students from several faculties of MRU (Law, Politics and Management, Economics and Finance Management, Social Informatics, Social Policy. The paper discusses the ESP learning experience at Mykolas Romeris University and presents research findings obtained through the questionnaire survey.Findings—comparative analysis between full-time and part-time study mode student responses reveals similar learning patterns; however, certain differences can also be observed. The full-time students are motivated by more advanced authentic learning materials and they are more computer literate and able to access these materials, whereas the respondents from the part-time study mode appreciate more traditional Internet-based language learning tools.Research limitations/implications—the research sample was composed of first year Bachelor study programme students, therefore the results cannot be generalised and applied to Master level students.Practical implications—awareness of student needs and problems encountered in authentic learning environment may help improve ESP teaching methods.Originality/Value—gaining insight into student perception of authenticity in learning process and technological proficiency to access authentic resourcesKeywords: authenticity, student autonomy, ESP context, information communication technologies (ICT.Research type: research paper.

  8. Rh2(esp)2-catalyzed allylic and benzylic oxidations.

    Science.gov (United States)

    Wang, Yi; Kuang, Yi; Wang, Yuanhua

    2015-04-07

    The dirhodium(II) catalyst Rh2(esp)2 allows direct solvent-free allylic and benzylic oxidations by T-HYDRO with a remarkably low catalyst loading. This method is operationally simple and scalable at ambient temperature without the use of any additives. The high catalyst stability in these reactions may be attributed to a dirhodium(II,II) catalyst resting state, which is less prone to decomposition.

  9. ELT, ESP & EAP in Nepal: whose interests are served?

    OpenAIRE

    Shrestha, Prithvi

    2008-01-01

    This paper gives an overview of the state of English Language Teaching (ELT) in Nepal in general and draws a link between ELT and English for Academic Purposes (EAP) and English for Specific Purposes (ESP). The researcher briefly examines the current situation at primary, secondary and tertiary level. The impact of this is assessed from a critical applied-linguistics perspective, to see how the English language has affected the society as a whole, particularly the English-vernacular (Nepali) ...

  10. The role of ESP courses in general English proficiency

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    Vesna Cigan

    2013-12-01

    Full Text Available The purpose of the present paper is the study of the interaction between learning English for Specific Purposes (ESP, in particular, English for the Financial Sector, and general English proficiency. The research examines the effects of an ESP course being taught for a year on the students' general English proficiency.Two sets of tests were prepared for that purpose and administered to 30 first-year students of finance and law. The students took the placement test twice, at the beginning and at the end of the school year. To monitor test performance over a research period, a parallel form measuring the same competences was administered at the beginning of the second semester. In the test development process a special consideration has been paid to the level of difficulty and its relation to the students' prior educational context. Drawing on the National State Matura exams the test is set at Common European Framework of Reference for Languages (CEFR Level B2. As regards its content the test is comprised of reading comprehension tasks (multiple matching, multiple-choice cloze, gapped text and grammar tasks aiming to examine lexical and grammatical competence.There were two major assumptions in this study: 1 Learning ESP can improve students' general English proficiency, and 2 There is a more substantial improvement in lexical competence as compared to the improvement in grammatical competence.There is strong evidence in support of the first hypothesis, whereas for the second one the results were ambiguous. After major findings are presented and discussed, implications for ESP teaching are given in closing.

  11. The Literal Translation Hypothesis in ESP Teaching/Learning Environments

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    Pedro A. Fuertes-Olivera

    2015-11-01

    Full Text Available Research on the characteristics of specialized vocabulary usually replicates studies that deal with general words, e.g. they typically describe frequent terms and focus on their linguistic characteristics to aid in the learning and acquisition of the terms. We dispute this practise, as we believe that the basic characteristic of terms is that they are coined to restrict meaning, i.e. to be as precise and as specific as possible in a particular context. For instance, around 70% of English and Spanish accounting terms are multi-word terms, most of which contain more than three orthographic words that syntactically behave in a way that is very different from the syntactic behaviour of the node on which they are formed (Fuertes-Olivera and Tarp, forthcoming. This has prompted us to propose a research framework that investigates whether or not the literal translation hypothesis, which has been addressed in several areas of translation studies, can also be applied in ESP teaching/learning environments. If plausible, the assumptions on which this hypothesis is based can shed light on how learners disambiguate terms they encounter. Within this framework, this paper presents evidence that the literal translation hypothesis is possible in ESP; it offers the results of a pilot study that sheds light on how this hypothesis may work, and also discusses its usability in the context of ESP learning. In particular, this paper presents strategies for teaching multi-word terms that are different from those currently based on corpus data. We believe that exercises such as “cloze”, “fill in” and similar “guessing” exercises must be abandoned in ESP teaching/learning environments. Instead, we propose exercises that reproduce L1 teaching and learning activities, i.e., exercises that are typically used when acquiring specialised knowledge and skills in any domain, e.g. taking part in meetings and giving presentations in a business context.

  12. Thermal behaviour of ESP ash from municipal solid waste incinerators.

    Science.gov (United States)

    Yang, Y; Xiao, Y; Wilson, N; Voncken, J H L

    2009-07-15

    Stricter environmental regulations demand safer treatment and disposal of incinerator fly ashes. So far no sound technology or a process is available for a sustainable and ecological treatment of the waste incineration ashes, and only partial treatment is practised for temporary and short-term solutions. New processes and technology need to be developed for comprehensive utilization and detoxification of the municipal solid waste (MSW) incinerator residues. To explore the efficiency of thermal stabilisation and controlled vitrification, the thermal behaviour of electrostatic precipitator (ESP) ash was investigated under controlled conditions. The reaction stages are identified with the initial moisture removal, volatilization, melting and slag formation. At the temperature higher than 1100 degrees C, the ESP ashes have a quicker weight loss, and the total weight loss reaches up to 52%, higher than the boiler ash. At 1400 degrees C a salt layer and a homogeneous glassy slag were formed. The effect of thermal treatment on the leaching characteristics of various elements in the ESP ash was evaluated with the availability-leaching test. The leaching values of the vitrified slag are significantly lowered than that of the original ash.

  13. Espécies vegetais indicadas na odontologia

    Directory of Open Access Journals (Sweden)

    Francielda Q. Oliveira

    Full Text Available Foi realizada uma revisão bibliográfica sobre plantas medicinais indicadas para afecções odontológicas, incluindo livros, artigos e sites científicos e populares. Os dados foram compilados em uma tabela contendo informações como nome científico, popular, família, parte utilizada e forma farmacêutica. Foram encontradas 132 espécies, distribuídas em 52 Famílias Botânicas citadas como úteis no tratamento de afecções odontológicas. As espécies mais citadas de acordo com a bibliografia consultada foram Punica granatum L. (10 citações, Althaea officinalis L.(8, Salvia officinalis L. (8, Calendula officinalis L.(8, Malva sylvestris L (7, Plantago major L. (6. O conjunto destes resultados deve permitir um perfil de espécies para uso em odontologia e contribuir para o direcionamento de pesquisas nesta área, culminando com o desenvolvimento de fitoterápicos de qualidade e validados para uso odontológico, bem como permitindo a divulgação destes estudos para a população e profissionais afins.

  14. Strategic features of ESP from a socio-cognitive perspective

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    Ana María Roldán Riejos

    2004-04-01

    Full Text Available It has been observed that the analysis of elements traditionally associated with the English for Specific Purposes (ESP area, grammatical, lexical or rhetorical, has not sufficiently covered so far the variability and complexity of ESP communication. Nevertheless, since the 1990s, an emergent line of investigation has been contributing and offering new insights into this field (White, 1998, 2001; Cameron & Low, 1999a; Roldán, 1999; Draaisma, 2001; Roldán et al. 2001; Úbeda, 2001. This trend of research adopts the cognitive/experientialist approach proposed in Lakoff (1987, Sweetser (1990, or Fauconnier (1997, among others. Given the importance of social and cognitive components in communication, the aim of this paper is to explore strategic features of professional and academic technical discourse. Accordingly, we have attempted to show the interconnection of genre and register features in ESP communication in a selection of authentic texts. The communicative role that metaphoric and metonymic aspects playhas also been considered. In addition to this, the function of hedging as evidence of reader/writer interaction and viewed as a social and cognitive phenomenon is illustrated and discussed and, finally, future research points are suggested.

  15. X-ray spectrophotometer SphinX and particle spectrometer STEP-F of the satellite experiment CORONAS-PHOTON. Preliminary results of the joint data analysis

    Science.gov (United States)

    Dudnik, O. V.; Podgorski, P.; Sylwester, J.; Gburek, S.; Kowalinski, M.; Siarkowski, M.; Plocieniak, S.; Bakala, J.

    2012-04-01

    A joint analysis is carried out of data obtained with the help of the solar X-ray SphinX spectrophotometer and the electron and proton satellite telescope STEP-F in May 2009 in the course of the scientific space experiment CORONAS-PHOTON. In order to determine the energies and particle types, in the analysis of spectrophotometer records data are used on the intensities of electrons, protons, and secondary γ-radiation, obtained by the STEP-F telescope, which was located in close proximity to the SphinX spectrophotometer. The identical reaction of both instruments is noted at the intersection of regions of the Brazilian magnetic anomaly and the Earth's radiation belts. It is shown that large area photodiodes, serving as sensors of the X-ray spectrometer, reliably record electron fluxes of low and intermediate energies, as well as fluxes of the secondary gamma radiation from construction materials of detector modules, the TESIS instrument complex, and the spacecraft itself. The dynamics of electron fluxes, recorded by the SphinX spectrophotometer in the vicinity of a weak geomagnetic storm, supplements the information about the processes of radial diffusion of electrons, which was studied using the STEP-F telescope.

  16. Optimization of low-diffusion EUV resist for linewidth roughness and pattern collapse on various substrates

    Science.gov (United States)

    Thackeray, James W.; Cameron, James F.; Wagner, Michael; Coley, Suzanne; Ongayi, Owendi; Montgomery, Warren; Lovell, Dave; Biafore, John; Chakrapani, Vidhya; Ko, Akiteru

    2012-03-01

    This paper will report on our development of low diffusion EUV resists based on polymer-bound PAG technology. With our low diffusion resist, a wide process window for 30-nm hp of 280nm DOF over a 10% exposure range is achieved on a prototype ADT fullfield scanner. Linewidth roughness of 3.1nm is also achieved. Excellent resist profiles can be achieved on organic ULs or Si hardmask materials. This resist also shows only 1.1 nm carbon growth on witness plate mirrors for cleanables, and no reflectivity loss after mirror cleaning. These results clearly pass for use on all NXE exposure tools. We also have shown good pattern transfer for a Si HM stack using this resist. Finally, we report 17-nm hp resolution at a dose of 14.5mj for a higher absorption resist.

  17. Fast-mode Coronal EUV Wave Trains Associated with Solar Flares and CMEs

    Science.gov (United States)

    Liu, Wei; Ofman, Leon; Downs, Cooper; Karlicky, Marian; Chen, Bin

    2017-08-01

    As a new observational phenomenon, Quasi-periodic, Fast Propagating EUV wave trains (QFPs) are fast-mode magnetosonic waves closely related to quasi-periodic pulsations commonly detected in solar flares (traditionally with non-imaging observations). They can provide critical clues to flare energy release and serve as new tools for coronal seismology. We report recent advances in observing and modeling QFPs, including evidence of heating and cooling cycles revealed with differential emission measure (DEM) analysis that are consistent with alternating compression and rarefaction expected for magnetosonic waves. Through a statistical survey, we found a preferential association of QFPs with eruptive flares (with CMEs) rather than confined flares (without CMEs). We also identified some correlation with quasi-periodic radio bursts observed at JVLA and Ondrejov observatories. We will discuss the implications of these results and the potential roles of QFPs in coronal heating and energy transport.

  18. Sounding rocket measurement of the absolute solar EUV flux utilizing a silicon photodiode

    Science.gov (United States)

    Ogawa, H. S.; Mcmullin, D.; Judge, D. L.; Canfield, L. R.

    1990-01-01

    A newly developed stable and high quantum efficiency silicon photodiode was used to obtain an accurate measurement of the integrated absolute magnitude of the solar extreme UV photon flux in the spectral region between 50 and 800 A. The adjusted daily 10.7-cm solar radio flux and sunspot number were 168.4 and 121, respectively. The unattenuated absolute value of the solar EUV flux at 1 AU in the specified wavelength region was 6.81 x 10 to the 10th photons/sq cm per s. Based on a nominal probable error of 7 percent for National Institute of Standards and Technology detector efficiency measurements in the 50- to 500-A region (5 percent on longer wavelength measurements between 500 and 1216 A), and based on experimental errors associated with the present rocket instrumentation and analysis, a conservative total error estimate of about 14 percent is assigned to the absolute integral solar flux obtained.

  19. A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

    Energy Technology Data Exchange (ETDEWEB)

    Huh, S.; Ren, L.; Chan, D.; Wurm, S.; Goldberg, K. A.; Mochi, I.; Nakajima, T.; Kishimoto, M.; Ahn, B.; Kang, I.; Park, J.-O.; Cho, K.; Han, S.-I.; Laursen, T.

    2010-03-12

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. yet link data is available for understanding native defects on real masks. In this paper, a full-field EUV mask is fabricated to investigate the printability of various defects on the mask. The printability of defects and identification of their source from mask fabrication to handling were studied using wafer inspection. The printable blank defect density excluding particles and patterns is 0.63 cm{sup 2}. Mask inspection is shown to have better sensitivity than wafer inspection. The sensitivity of wafer inspection must be improved using through-focus analysis and a different wafer stack.

  20. Fabrication and performance of nanoscale ultra-smooth programmeddefects for EUV Lithography

    Energy Technology Data Exchange (ETDEWEB)

    Olynick, D.L.; Salmassi, F.; Liddle, J.A.; Mirkarimi, P.B.; Spiller, E.; Baker, S.L.; Robinson, J.

    2005-02-01

    We have developed processes for producing ultra-smooth nanoscale programmed substrate defects that have applications in areas such as thin film growth, EUV lithography, and defect inspection. Particle, line, pit, and scratch defects on the substrates between 40 and 140 nm wide 50 to 90 nm high have been successfully produced using e-beam lithograpy and plasma etching in both Silicon and Hydrosilsequioxane films. These programmed defect substrates have several advantages over those produced previously using gold nanoparticles or polystyrene latex spheres--most notably, the ability to precisely locate features and produce recessed as well as bump type features in ultra-smooth films. These programmed defects were used to develop techniques for film defect mitigation and results are discussed.

  1. Electron irradiation-enhanced water and hydrocarbon adsorption in EUV lithography devices

    Science.gov (United States)

    Al-Ajlony, A.; Kanjilal, A.; Catalfano, M.; Harilal, S. S.; Hassanein, A.

    2014-01-01

    The accumulation of water and hydrocarbons molecules on pure Au smooth surfaces were monitored during 100 eV electron bombardment at various beam current levels. Our studies showed that these low energy electrons could accelerate the physical adsorption processes of the gaseous contaminant molecules on the mirror surface. The 100 eV electron beam was used to provide a rough simulation of the secondary electrons generated during the interaction between the EUV beam at 13.5 nm wavelength and the mirror surface in an EUVL device. The adsorption enhancement phenomenon was explained in accordance with Langmuir's Adsorption model by the increase of the sticking coefficient of adsorbed molecules onto the mirror surface. We have also shown that a positive biasing of the top of mirror surface can be used for preventing the secondary electron emission from the mirror surface.

  2. Electron irradiation-enhanced water and hydrocarbon adsorption in EUV lithography devices

    Energy Technology Data Exchange (ETDEWEB)

    Al-Ajlony, A., E-mail: aalajlon@purdue.edu; Kanjilal, A.; Catalfano, M.; Harilal, S.S.; Hassanein, A.

    2014-01-15

    The accumulation of water and hydrocarbons molecules on pure Au smooth surfaces were monitored during 100 eV electron bombardment at various beam current levels. Our studies showed that these low energy electrons could accelerate the physical adsorption processes of the gaseous contaminant molecules on the mirror surface. The 100 eV electron beam was used to provide a rough simulation of the secondary electrons generated during the interaction between the EUV beam at 13.5 nm wavelength and the mirror surface in an EUVL device. The adsorption enhancement phenomenon was explained in accordance with Langmuir's Adsorption model by the increase of the sticking coefficient of adsorbed molecules onto the mirror surface. We have also shown that a positive biasing of the top of mirror surface can be used for preventing the secondary electron emission from the mirror surface.

  3. High resolution EUV spectroscopy of xenon ions with a compact electron beam ion trap

    Science.gov (United States)

    Ali, Safdar; Nakamura, Nobuyuki

    2017-09-01

    We performed high resolution extreme ultraviolet (EUV) spectroscopy measurements of highly charged xenon ions with a compact electron beam ion trap. The spectra were recorded with a flat-field grazing incidence spectrometer while varying the electron beam energy between 200 and 890 eV. We measured the wavelengths for several lines of Rh-like Xe9+ - Cd-like Xe6+ and Cu-like Xe25+- Se-like Xe20+ in the range of 150-200 Å with an uncertainty of 0.05 Å. Previously, most of these lines have been reported from EBITs with a wavelength uncertainty of 0.2 Å. Additionally, based on the electron beam energy dependence of the observed spectra we tentatively identified three new lines, which were reported as unidentified lines in the previous studies.

  4. The High-Resolution Lightweight Telescope for the EUV (HiLiTE)

    Energy Technology Data Exchange (ETDEWEB)

    Martinez-Galarce, D S; Boerner, P; Soufli, R; De Pontieu, B; Katz, N; Title, A; Gullikson, E M; Robinson, J C; Baker, S L

    2008-06-02

    The High-resolution Lightweight Telescope for the EUV (HiLiTE) is a Cassegrain telescope that will be made entirely of Silicon Carbide (SiC), optical substrates and metering structure alike. Using multilayer coatings, this instrument will be tuned to operate at the 465 {angstrom} Ne VII emission line, formed in solar transition region plasma at {approx}500,000 K. HiLiTE will have an aperture of 30 cm, angular resolution of {approx}0.2 arc seconds and operate at a cadence of {approx}5 seconds or less, having a mass that is about 1/4 that of one of the 20 cm aperture telescopes on the Atmospheric Imaging Assembly (AIA) instrument aboard NASA's Solar Dynamics Observatory (SDO). This new instrument technology thus serves as a path finder to a post-AIA, Explorer-class missions.

  5. EUV microexposures at the ALS using the 0.3-NA MET projectionoptics

    Energy Technology Data Exchange (ETDEWEB)

    Naulleau, Patrick; Goldberg, Kenneth A.; Anderson, Erik; Cain,Jason P.; Denham, Paul; Hoef, Brian; Jackson, Keith; Morlens,Anne-Sophie; Rekawa, Seno; Dean, Kim

    2005-09-01

    The recent development of high numerical aperture (NA) EUV optics such as the 0.3-NA Micro Exposure Tool (MET) optic has given rise to a new class of ultra-high resolution microexposure stations. Once such printing station has been developed and implemented at Lawrence Berkeley National Laboratory's Advanced Light Source. This flexible printing station utilizes a programmable coherence illuminator providing real-time pupil-fill control for advanced EUV resist and mask development. The Berkeley exposure system programmable illuminator enables several unique capabilities. Using dipole illumination out to {sigma}=1, the Berkeley tool supports equal-line-space printing down to 12 nm, well beyond the capabilities of similar tools. Using small-sigma illumination combined with the central obscuration of the MET optic enables the system to print feature sizes that are twice as small as those coded on the mask. In this configuration, the effective 10x-demagnification for equal lines and spaces reduces the mask fabrication burden for ultra-high-resolution printing. The illuminator facilitates coherence studies such as the impact of coherence on line-edge roughness (LER) and flare. Finally the illuminator enables novel print-based aberration monitoring techniques as described elsewhere in these proceedings. Here we describe the capabilities of the new MET printing station and present system characterization results. Moreover, we present the latest printing results obtained in experimental resists. Limited by the availability of high-resolution photoresists, equal line-space printing down to 25 nm has been demonstrated as well as isolated line printing down to 29 nm with an LER of approaching 3 nm.

  6. Automated finishing of diamond turned dies for hard x-ray and EUV optics replication

    Science.gov (United States)

    Beaucamp, Anthony T. H.; Namba, Yoshiharu; Freeman, Richard R.

    2012-10-01

    Ultra-precision diamond turning can deliver very accurate form, often less than 100nm P-V. A possible manufacturing method for thin Wolter type-1 mirrors in hard X-ray space telescopes thus involves generating electroless nickel plated mandrels by diamond turning, before coating them with a reflective film and substrate. However, the surface texture after turning falls far short from the requirements of X-ray and EUV applications. The machining marks need to be removed, with hand polishing still widely employed. There is thus a compelling need for automated finishing of turned dies. A two step finishing method is presented that combines fluid jet and precessed bonnet polishing on a common 7-axis CNC platform. This method is capable of finishing diamond turned electroless nickel plated dies down to 0.28nm rms roughness, while deterministically improving form error down to 30nm P-V. The fluid jet polishing process, which consists of pressurizing water and abrasive particles for delivery through a nozzle, has been specially optimized with a newly designed slurry delivery unit and computer simulations, to remove diamond turning marks without introducing another waviness signature. The precessed bonnet polishing method, which consists of an inflated membrane rotated at an angle from the local normal to the surface and controlled by geometrical position relative to the work-piece, is subsequently employed with a novel control algorithm to deliver scratch-free surface roughness down to 0.28 nm rms. The combination of these two deterministic processes to finish aspheric and freeform dies promises to unlock new frontiers in X-ray and EUV optics fabrication.

  7. Influence of the solar EUV flux on the Martian plasma environment

    Directory of Open Access Journals (Sweden)

    R. Modolo

    2005-02-01

    Full Text Available The interaction of the solar wind with the Martian atmosphere and ionosphere is investigated by using three-dimensional, global and multi-species hybrid simulations. In the present work we focus on the influence of the solar EUV flux on the Martian plasma environment by comparing simulations done for conditions representative of the extrema of the solar cycle. The dynamics of four ionic species (H+, He++, O+, O2+, originating either from the solar wind or from the planetary plasma, is treated fully kinetically in the simulation model in order to characterize the distribution of each component of the plasma, both at solar maximum and at solar minimum. The solar EUV flux controls the ionization frequencies of the exospheric species, atomic hydrogen and oxygen, as well as the density, the temperature, and thus the extension of the exosphere. Ionization by photons and by electron impacts, and the main charge exchange reactions are self-consistently included in the simulation model. Simulation results are in reasonable agreement with the observations made by Phobos-2 and Mars Global Surveyor (MGS spacecraft: 1 the interaction creates a cavity, void of solar wind ions (H+, He++, which depends weakly upon the phase of the solar cycle, 2 the motional electric field of the solar wind flow creates strong asymmetries in the Martian environment, 3 the spatial distribution of the different components of the planetary plasma depends strongly upon the phase of the solar cycle. The fluxes of the escaping planetary ions are computed from the simulated data and results for solar maximum are compared with estimates based on the measurements made by experiments ASPERA and TAUS on board Phobos-2.

  8. TIMED solar EUV experiment: preflight calibration results for the XUV photometer system

    Science.gov (United States)

    Woods, Thomas N.; Rodgers, Erica M.; Bailey, Scott M.; Eparvier, Francis G.; Ucker, Gregory J.

    1999-10-01

    The Solar EUV Experiment (SEE) on the NASA Thermosphere, Ionosphere, and Mesosphere Energetics and Dynamics (TIMED) mission will measure the solar vacuum ultraviolet (VUV) spectral irradiance from 0.1 to 200 nm. To cover this wide spectral range two different types of instruments are used: a grating spectrograph for spectra between 25 and 200 nm with a spectral resolution of 0.4 nm and a set of silicon soft x-ray (XUV) photodiodes with thin film filters as broadband photometers between 0.1 and 35 nm with individual bandpasses of about 5 nm. The grating spectrograph is called the EUV Grating Spectrograph (EGS), and it consists of a normal- incidence, concave diffraction grating used in a Rowland spectrograph configuration with a 64 X 1024 array CODACON detector. The primary calibrations for the EGS are done using the National Institute for Standards and Technology (NIST) Synchrotron Ultraviolet Radiation Facility (SURF-III) in Gaithersburg, Maryland. In addition, detector sensitivity and image quality, the grating scattered light, the grating higher order contributions, and the sun sensor field of view are characterized in the LASP calibration laboratory. The XUV photodiodes are called the XUV Photometer System (XPS), and the XPS includes 12 photodiodes with thin film filters deposited directly on the silicon photodiodes' top surface. The sensitivities of the XUV photodiodes are calibrated at both the NIST SURF-III and the Physikalisch-Technische Bundesanstalt (PTB) electron storage ring called BESSY. The other XPS calibrations, namely the electronics linearity and field of view maps, are performed in the LASP calibration laboratory. The XPS and solar sensor pre-flight calibration results are primarily discussed as the EGS calibrations at SURF-III have not yet been performed.

  9. ABS plus and ESP - a concept for making dynamics manageable; ABS plus und ESP - Ein Konzept zur Beherrschung der Fahrdynamik

    Energy Technology Data Exchange (ETDEWEB)

    Fennel, H. [ITT Automotive Europe GmbH, Frankfurt am Main (Germany). Methodenentwicklung/Regelungstechnik

    1998-04-01

    The classic anti-lock braking system (ABS) has been established in passenger cars for about two decades. Continuous functional improvements are the result of consistent upgrading and optimisation. With ABS plus from ITT Automotive, this safety system has reached another climax, for ABS plus assists the driver in all dynamic manoeuvres - under full and partial braking conditions. The ESP system developed by ITT Automotive under the designation ASMS (Automotive Stability Management System) is an automatic stability control system that helps master critical situations during acceleration, braking and steering. Thereby ESP monitors vehicle movements with the assistance of the most advanced sensor technology available. (orig.) [Deutsch] Das klassische Antiblockiersystem (ABS) ist seit etwa zwei Jahrzehnten im Pkw etabliert. Durch kontinuierliche Weiterentwicklung und Optimierung konnte seine Funktion staendig verbessert werden. Mit dem ABS plus von ITT Automotive wird ein neuartiges Sicherheitssystem vorgestellt, das den Fahrer bei allen dynamischen Fahrmanoevern im Voll- und im Teilbremsbereich unterstuetzt. Das Elektronische Stabilitaetsprogramm ESP, das bei ITT Automotive unter dem Namen ASMS (Automatisches Stabilitaets-Management-System) entwickelt wurde, ist ein Fahrdynamik-Regelsystem, das alle kritischen Situationen waehrend des Beschleunigens, Bremsens und Lenkens meistern hilft. (orig.)

  10. 77 FR 55507 - Approval of Transfer of Early Site Permit (ESP) and Conforming Amendment, Virginia Electric and...

    Science.gov (United States)

    2012-09-10

    ... COMMISSION Approval of Transfer of Early Site Permit (ESP) and Conforming Amendment, Virginia Electric and Power Company, North Anna ESP Site AGENCY: Nuclear Regulatory Commission. ACTION: Notice of request for...) interest in the North Anna ESP [Early Site Permit] Site's Early Site Permit (ESP-003). The transfer would...

  11. The Effects of Oxygen Plasma on the Chemical Composition and Morphology of the Ru Capping Layer of the Extreme Ultraviolet (EUV) Mask Blanks

    Energy Technology Data Exchange (ETDEWEB)

    Belau, Leonid; Park, Jeong Y.; Liang, Ted; Somorjai, Gabor A.

    2008-06-07

    Contamination removal from extreme ultraviolet (EUV) mask surfaces is one of the most important aspects to improve reliability for the next generation of EUV lithography. We report chemical and morphological changes of the ruthenium (Ru) mask surface after oxygen plasma treatment using surface sensitive analytical methods: X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and transmission electron microscopy (TEM). Chemical analysis of the EUV masks shows an increase in the subsurface oxygen concentration, Ru oxidation and surface roughness. XPS spectra at various photoelectron takeoff angles suggest that the EUV mask surface was covered with chemisorbed oxygen after oxygen plasma treatment. It is proposed that the Kirkendall effect is the most plausible mechanism that explains the Ru surface oxidation. The etching rate of the Ru capping layer by oxygen plasma was estimated to be 1.5 {+-} 0.2 {angstrom}/min, based on TEM cross sectional analysis.

  12. High-Density Diffraction Imaging and Non-Imaging Grating Elements for EUV and X-ray Spectroscopy Fabricated by DUV Reduction Photolithography Project

    Data.gov (United States)

    National Aeronautics and Space Administration — There is a need for lightweight high-density (4000+ lines/mm) novel diffraction grating elements in modern telescopes to advance EUV and X-ray astrophysics. Current...

  13. Influence of enterococcal surface protein (esp) on the transport of Enterococcus faecium within saturated quartz sands.

    Science.gov (United States)

    Johanson, Jennifer J; Feriancikova, Lucia; Xu, Shangping

    2012-02-07

    Enterococcus was selected by US EPA as a Gram-positive indicator microorganism for groundwater fecal contamination. It was recently reported that enterococcal surface protein (esp) was more prevalent in Enterococcus from human sources than in Enterococcus from nonhuman sources and esp could potentially be used as a source tracking tool for fecal contamination (Scott et al., 2005). In this research, we performed laboratory column transport experiments to investigate the transport of Enterococcus faecium within saturated quartz sands. Particularly, we used a wild type strain (E1162) and a mutant (E1162Δesp) to examine the influence of esp on the transport behavior of E. faecium. Our results showed that esp could significantly enhance the attachment of E. faecium cells onto the surface of silica sands and thus lower the mobility of E. faecium within sand packs. Cell surface properties (e.g., zeta potential) were determined and the extended Derjaguin-Landau-Verwey-Overbeek (XDLVO) theory was applied to explain the effects of esp on the retention of E. faecium. Overall, our results suggested that E. faecium strains with esp could display lower mobility within saturated sand packs than E. faecium strains without esp. The disparity in the transport behavior of E. faecium with and without esp could limit the effectiveness of esp as a source tracking tool within the groundwater system.

  14. Fluorescence spectrophotometer analysis of polycyclic aromatic hydrocarbons in environmental samples based on solid phase extraction using molecularly imprinted polymer.

    Science.gov (United States)

    Krupadam, Reddithota J; Bhagat, Bhagyashree; Wate, Satish R; Bodhe, Ghanshyam L; Sellergren, Borje; Anjaneyulu, Yerramilli

    2009-04-15

    A molecularly imprinted polymer (MIP) was synthesized using a polycyclic aromatic hydrocarbon (PAH) standard as a template, methacrylic acid as a functional monomer, ethylene glycol dimethacrylate as a cross-linker, and acetonitrile as a porogen. This polymer was used as a solid phase adsorbent for the quantitative enrichment of PAHs in coastal sediments, atmospheric particulates, and industrial effluents. The MIP selective adsorption capacity for PAHs started reducing when the chemical oxygen demand (COD) and total dissolved solids (TDS) was more than 800 mg L(-1) in the targeted environmental samples. The adsorption stability of the MIP was tested by the consecutive contact of environmental samples, and it was shown that the performance of the MIP did not vary after 10 enrichments and desorption cycles. Recoveries of eight PAH compounds, extracted from 10 g of coastal sediments and 1 L of industrial effluent spiked with 10 microL of standard PAHs, showed recoveries between 85 and 96%. The fluorescence spectrophotometer limit of detection of PAHs varied from 10 to 30 etag L(-1) in industrial effluent and from 0.1 to 2.9 etag kg(-1) in solid samples (coastal sediment and atmospheric particulates), and this indicates that the environmental analytical method is significantly sensitive, when compared with other commonly used methods such as gas chromatography-mass spectrometry and liquid chromatography-mass spectrometry.

  15. Influence of surface layer removal of shade guide tabs on the measured color by spectrophotometer and spectroradiometer.

    Science.gov (United States)

    Kim, Jin-Cheol; Yu, Bin; Lee, Yong-Keun

    2008-12-01

    To determine the changes in color parameters of Vitapan 3D-Master shade guide tabs by a spectrophotometer (SP) or a spectroradiometer (SR), and by the removal of the surface layer of the tabs that was performed to make a flat measuring surface for the SP color measurement. Color of the shade tabs was measured before and after removing the surface layer of the tabs using SP and SR. Correlations between the color parameters between the original (OR) and the surface layer removed (RM) tabs and between the SP and the SR measurements were determined (alpha=0.05). Based on SP, the lightness, chroma, CIE a* and b* values measured after the surface layer removal were higher than those of the original tabs except a few cases. Based on SR, the chroma and CIE a* and b* values measured after surface layer removal were higher than those of the original tabs except a few cases; however, in case of the lightness, the changes varied by the shade designation. Type of instrument influenced the changes in color parameters based on paired t-test (pspectrophotometer or a spectroradiometer, measurement protocols should be specified because color difference by the surface layer removal and the instrument was high.

  16. Intersstellar absorption lines between 2000 and 3000 A in nearby stars observed with BUSS. [Balloon Borne Ultraviolet Spectrophotometer

    Science.gov (United States)

    De Boer, K. S.; Lenhart, H.; Van Der Hucht, K. A.; Kamperman, T. M.; Kondo, Y.

    1986-01-01

    Spectra obtained between 2000 and 3000 A with the Balloon Borne Ultraviolet Spectrophotometer (BUSS) payload were examined for interstellar absorption lines. In bright stars, with spectral types between O9V and F5V, such lines were measured of Mg I, Mg II, Cr II, Mn II, Fe II and Zn II, with Cr II and Zn II data of especially high quality. Column densities were derived and interstellar abundances were determined for the above species. It was found that metal depletion increases with increasing E(B-V); Fe was most affected and Zn showed a small depletion for E(B-V) greater than 0.3 towards Sco-Oph. The metal column densities, derived for Alpha-And, Kappa-Dra, Alpha-Com, Alpha-Aql, and 29 Cyg were used to infer N(H I). It was shown that the ratio of Mg I to Na I is instrumental in determining the ionization structure along each line of sight. The spectra of Aql stars confirms the presence of large gas densities near Alpha-Oph. Moreover, data indicated that the Rho-Oph N(H I) value needs to be altered to 35 x 10 to the 20th/sq cm, based on observed ion ratios and analysis of the Copernicus L-alpha profile.

  17. Analysis of Shade Matching in Natural Dentitions Using Intraoral Digital Spectrophotometer in LED and Filtered LED Light Sources.

    Science.gov (United States)

    Chitrarsu, Vijai Krishnan; Chidambaranathan, Ahila Singaravel; Balasubramaniam, Muthukumar

    2017-10-31

    To evaluate the shade matching capabilities in natural dentitions using Vita Toothguide 3D-Master and an intraoral digital spectrophotometer (Vita Easyshade Advance 4.0) in various light sources. Participants between 20 and 40 years old with natural, unrestored right maxillary central incisors, no history of bleaching, orthodontic treatment, or malocclusion and no rotations were included. According to their shades, subjects were randomly selected and grouped into A1, A2, and A3. A total of 100 participants (50 male and 50 female) in each group were chosen for this study. Shade selection was made between 10 am and 2 pm for all light sources. The same examiner selected the shade of natural teeth with Vita Toothguide 3D-Master under natural light within 2 minutes. Once the Vita Toothguide 3D-Masterwas matched with the maxillary right central incisor, the L*, a*, and b* values, chroma, and hue were recorded with Vita Easyshade Advance 4.0 by placing it on the shade tab under the same light source. The values were statistically analyzed using one-way ANOVA and Tukey's HSD post hoc test with SPSS v22.0 software. The mean ∆E*ab values for shades A1, A2, and A3 for groups 1, 2, and 3 were statistically significantly different from each other (p 3D-Master. Incandescent light showed more accurate shade matching than the filtered LED, LED, and daylight. © 2017 by the American College of Prosthodontists.

  18. Collocations and collocation types in ESP textbooks: Quantitative pedagogical analysis

    Directory of Open Access Journals (Sweden)

    Bogdanović Vesna Ž.

    2016-01-01

    Full Text Available The term collocation, even though it is rather common in the English language grammar, it is not a well known or commonly used term in the textbooks and scientific papers written in the Serbian language. Collocating is usually defined as a natural appearance of two (or more words, which are usually one next to another even though they can be separated in the text, while collocations are defined as words with natural semantic and/or syntactic relations being joined together in a sentence. Collocations are naturally used in all English written texts, including scientific texts and papers. Using two textbooks for English for Specific Purposes (ESP for intermediate students' courses, this paper presents the frequency of collocations and their typology. The paper tries to investigate the relationship between lexical and grammatical collocations written in the ESP texts and the reasons for their presence. There is an overview of the most used subtypes of lexical collocations as well. Furthermore, on applying the basic corpus analysis based on the quantitative analysis, the paper presents the number of open, restricted and bound collocations in ESP texts, trying to draw conclusions on their frequency and hence the modes for their learning. There is also a section related to the number and usage of scientific collocations, both common scientific and narrow-professional ones. The conclusion is that the number of present collocations in the selected two textbooks imposes a demand for further analysis of these lexical connections, as well as new modes for their teaching and presentations to the English learning students.

  19. ESP AS AN APPROACH OF ENGLISH LANGUAGE TEACHING IN ITS

    Directory of Open Access Journals (Sweden)

    Endang Susilowati

    2008-06-01

    Full Text Available According to National Curriculum Preparation Guideline 2004 – 2009, teaching English in ITS is classified into General Studies ( MKU and distributed into “ Personality Development – Related subject “ ( MPK – Mata Kuliah Pengembangan Kepribadian . However, English as subject has been redundantly placed within the ITS curriculum. While under the curriculum preparation guideline the subject falls into the category of Personality – Development related subjects, the course content involves a significant degree of skills that are required by the students during learning process at ITS. The teaching of English at ITS should therefore be designed to meet the demands for personality development, as well as knowledge and skills improvement. In the attempt of meeting these demands, the English teaching staff have agreed to adopt the ESP approach. The popular principle of English for Specific Purposes ( ESP is “ Tell me what you need English for and I will tell you the English that you need”. This principle suggests that ESP is an approach to language teaching which is oriented to fulfil learners’needs. So teaching English at the tertiary level for non English Department such as in ITS is still mostly concentrated on the need for the capability of reading relevant text books. The teaching of English is focused on the reading skill specialized in relevant text books which will reinforce the mastery of basic vocabulary and grammar because mastering reading skill is determined mostly by those two elements. However, this shift to gives other study skills such as note taking, group discussion, presentation and academic writing.

  20. ESP TEAM TEACHING AT TECHNICAL UNIVERSITIES: EXPERIENCE AND PERSPECTIVES

    Directory of Open Access Journals (Sweden)

    Elena I. Arkhipova

    2015-01-01

    Full Text Available The primary objectives of this paper are as follows: 1 to describe the experience of implementing interdisciplinary and single-subject team teaching into the educational process at Kalashnikov Izhevsk State Technical University while teaching English for Specific Purposes; 2 to assess the efficacy of the pedagogy through qualitative and quantitative students’ outcomes; 3 to discuss our experience and give recommendations for those interested in team-teaching.Methods. To evaluate the efficacy of team-based integrative teaching, we used quantitative and qualitative assessment. A set of quantitative pre- and postsurveys were administered in experimental team-taught group and a non-teamtaught «control» group. Students’ motivation and attitudes were evaluated through questionnaires, interviews and discussions.Results. The conducted experiment has showed that students in the experimental group considerably improved their level of mastering foreign language lexicon compared to the students in the «control» group. They also reinforced their motivation for learning English. Based on the results of the questionnaire analysis and discussion, the authors have formulated recommendations for implementing team-teaching technology in educational process.Scientific novelty. The article contributes to the theory of developing the foreign language lexicon under integrative ESP and professional course instruction. The theory is based on combining ESP and professional discipline components at all stages of educational process. In addition, the authors have formulated the main challenges and advantages of single-subject team-teaching variations as well as the application where it brought the best results.Practical significance. The authors suggested some valuable recommendations on planning and implementing the educational process with ESP teamteaching at a technical university.

  1. Sorindeia warneckei Engl. (Anacardiaceae), une espèce multi ...

    African Journals Online (AJOL)

    Sorindeia warneckei est une espèce multi-usagère utilisée comme brosse à dent végétale. Sa pérennité est très menacée à cause des installations humaines et du manque d'informations scientifiques la concernant. La présente étude réalisée dans la dépression de la Lama (Région Maritime du Togo) vise une valorisation ...

  2. Utilisation des espèces du genre Aframomum ( Aframomum ...

    African Journals Online (AJOL)

    La génération des radicaux libres résultant de l'oxydation des lipides est l'un des problèmes associés à la perte des aliments et des maladies notamment celles liées au surpoids et à l'obésité. Les espèces oxygénées réactives telles que le radical hydroxyle et les hydroperoxydes sont généralement produites par des ...

  3. Hemiplegia espástica pura de origem piramidal

    OpenAIRE

    Ricardo de Oliveira Souza; Gusmão, Dayse L.; Wagner Martignoni de Figueiredo; Antonio C. Goulart Duarte

    1988-01-01

    Três pacientes acometidos de hemiplegia espástica pura apresentaram, à tomografia computadorizada, imagens hipodensas envolvendo regiões dos hemisférios cerebrais hoje identificadas como locais de passagem dos feixes córtico-nuclear e piramidal. Em nenhum deles se registraram alterações de forma, latência e amplitude dos potenciais evocados sômato-sensitivos. Com base nestes casos e em outros idênticos, recolhidos da literatura, reafirmamos a validade anátomo-clínica da síndrome piramidal, co...

  4. The plasma line revisited as an aeronomical diagnostic - Suprathermal electrons, solar EUV, electron-gas thermal balance

    Science.gov (United States)

    Carlson, H. C., Jr.; Mantas, G. P.; Wickwar, V. B.

    1977-01-01

    Spectra of plasma wave intensities in the ionosphere over Arecibo are calculated and compared with those from observations of the plasma line intensity. This approach involving directly observed quantities avoids the uncertainties that have plagued past comparisons with photoelectron theory. In addition, careful comparisons in physically relevant segments of the spectra show that any significant increase in the magnitude of the solar EUV flux would lead to a contradiction of the observed plasma wave intensities. Further, the comparisons indicate that resolution of the thermal electron-gas heat balance problem must be sought through better heat transfer rates (e.g., heating and cooling rates, etc.), rather than in the solar EUV. This approach utilizes more fully the potential of the plasma line experiment as a diagnostic tool for aeronomical studies, (e.g., photoelectrons, auroral secondaries, ionosphere-modification experiments, etc.).

  5. Effect of prepulse laser wavelength on EUV emission from CO2 reheated laser-produced Sn plasma

    Science.gov (United States)

    Freeman, J. R.; Harilal, S. S.; Hassanein, A.; Rice, B.

    2013-03-01

    We investigated the role of prepulse laser wavelength on extreme-ultraviolet (EUV) emission and ionic debris generation. A 6 ns Nd:YAG laser operating at 266 nm was used to generate a pre-plasma that was then reheated by a 35 ns CO2 laser pumping pulse at 10.6 μm. At an ideal delay time, improvement in EUV conversion efficiency (CE) of up to 30 % was seen compared to the CE from the pumping pulse alone. It was also shown that the most probable Sn ion kinetic energies were reduced significantly with the use of a prepulse, however, ion fluence increased. These results were compared to those obtained using a 1064 nm prepulse.

  6. Increased conjugation frequencies in clinical Enterococcus faecium strains harbouring the enterococcal surface protein gene esp.

    Science.gov (United States)

    Lund, B; Billström, H; Edlund, C

    2006-06-01

    This study compared the in-vitro ability of Enterococcus faecium isolates of different origin to acquire vanA by conjugation in relation to the occurrence of the esp gene. In total, 29 clinical isolates (15/29 esp+), 30 normal intestinal microflora isolates (2/30 esp+) and one probiotic strain (esp-) were studied with a filter-mating assay. Conjugation events were confirmed by PCR and pulsed-field gel electrophoresis. Among the infection-derived isolates, the esp+ isolates had higher conjugation frequencies compared with esp- isolates (p < 0.001), with a median value of 6.4 x 10(-6) transconjugants/donor. The probiotic strain was shown to acquire vanA vancomycin resistance in in-vitro filter mating experiments.

  7. Comparison of Helioseismic Far-Side Active Region Detections with STEREO Far-Side EUV Observations of Solar Activity

    Science.gov (United States)

    Liewer, P. C.; Qiu, J.; Lindsey, C.

    2017-10-01

    Seismic maps of the Sun's far hemisphere, computed from Doppler data from the Helioseismic and Magnetic Imager (HMI) on board the Solar Dynamics Observatory (SDO) are now being used routinely to detect strong magnetic regions on the far side of the Sun (http://jsoc.stanford.edu/data/farside/). To test the reliability of this technique, the helioseismically inferred active region detections are compared with far-side observations of solar activity from the Solar TErrestrial RElations Observatory (STEREO), using brightness in extreme-ultraviolet light (EUV) as a proxy for magnetic fields. Two approaches are used to analyze nine months of STEREO and HMI data. In the first approach, we determine whether new large east-limb active regions are detected seismically on the far side before they appear Earth side and study how the detectability of these regions relates to their EUV intensity. We find that while there is a range of EUV intensities for which far-side regions may or may not be detected seismically, there appears to be an intensity level above which they are almost always detected and an intensity level below which they are never detected. In the second approach, we analyze concurrent extreme-ultraviolet and helioseismic far-side observations. We find that 100% (22) of the far-side seismic regions correspond to an extreme-ultraviolet plage; 95% of these either became a NOAA-designated magnetic region when reaching the east limb or were one before crossing to the far side. A low but significant correlation is found between the seismic signature strength and the EUV intensity of a far-side region.

  8. Fibrillar Chromospheric Spicule-Like Counterparts to an EUV and Soft X-Ray Blowout Coronal Jet

    Science.gov (United States)

    Sterling, Alphonse C.; Harra, Louise K.; Moore, Ronald L.

    2010-01-01

    We observe an erupting jet feature in a solar polar coronal hole, using data from Hinode/SOT, EIS, and XRT, with supplemental data from STEREO/EUVI. From EUV and soft X-ray (SXR) images we identify the erupting feature as a blowout coronal jet: in SXRs it is a jet with bright base, and in EUV it appears as an eruption of relatively cool (approximately 50,000 K) material of horizontal size scale approximately 30" originating from the base of the SXR jet. In SOT Ca II H images the most pronounced analog is a pair of thin (approximately 1") ejections, at the locations of either of the two legs of the erupting EUV jet. These Ca II features eventually rise beyond 45", leaving the SOT field of view, and have an appearance similar to standard spicules except that they are much taller. They have velocities similar to that of "type II" spicules, approximately 100 kilometers per second, and they appear to have spicule-like substructures splitting off from them with horizontal velocity approximately 50 kilometers per second, similar to the velocities of splitting spicules measured by Sterling et al. (2010). Motions of splitting features and of other substructures suggest that the macroscopic EUV jet is spinning or unwinding as it is ejected. This and earlier work suggests that a sub-population of Ca II type II spicules are the Ca II manifestation of portions of larger-scale erupting magnetic jets. A different sub-population of type II spicules could be blowout jets occurring on a much smaller horizontal size scale than the event we observe here.

  9. Selection of materials for soft x-ray (SXR) and extreme ultraviolet (EUV) filters for space astronomy and other applications

    Science.gov (United States)

    Powell, Forbes R.; Drake, Virginia A.; Sandel, Bill R.; Mitchell, Donald G.

    1994-09-01

    This paper briefly reviews the more traditional materials that have been used for Soft X-Ray (SXR) and Extreme Ultraviolet (EUV) filters and then discusses several applications where new multilayer combinations of materials are being employed. The new applications include projection lithography and the detection of Energetic Neutral Atom (ENA) populations from spacecraft. Also briefly discussed is the use of polyimides for spacecraft filters.

  10. Diversité des espèces de mouches des fruits (Diptera : Tephritidae ...

    African Journals Online (AJOL)

    L'espèce invasive Bactrocera invadens Drew Tsuruta & White est la plus abondante dans les pièges (66,55% des captures), suivie de Dacus punctatifrons (Karsch) (29,92% des captures). La troisième espèce par ordre d'importance est Ceratitis cosyra (Walker) (3,38% des captures). Six autres espèces sont présentes mais ...

  11. ESP Needs Analysis Based Syllabus of Economics Faculty Students, Universitas “45” Makassar

    OpenAIRE

    Khalik, Lalu Abdul

    2014-01-01

    The main objective of this research is to design a syllabus and adapt materials on the basis of Students' needs. In order to achieve this objective, needs analysis of the students was carried out in advance. The research was conducted in Makassar by employing pre-ESP and post-ESP students as the source of primary data. As The source of supporting data, the researcher distributed questionnaire to graduates, ESP teachers, Head of Departments and graduates' employers/users. To effectively achi...

  12. Validation of the Earth atmosphere models using the EUV solar occultation data from the CORONAS and PROBA 2 instruments

    Science.gov (United States)

    Slemzin, Vladimir; Kuzin, Sergey; Berghmans, David; Pertsov, Andrey; Dominique, Marie; Ulyanov, Artyom; Gaikovich, Konstantin

    Absorption in the atmosphere below 500 km results in attenuation of the solar EUV flux, variation of its spectra and distortion of solar images acquired by solar EUV instruments operating on LEO satellites even on solar synchronous orbits. Occultation measurements are important for planning of solar observations from these satellites, and can be used for monitoring the upper atmosphere as well as for studying its response to the solar activity. We present the results of the occultation measurements of the solar EUV radiation obtained by the CORONAS-F/SPIRIT telescope at high solar activity (2002), by the CORONAS-Photon/TESIS telescope at low activity (2009), and by the SWAP telescope and LYRA radiometer onboard the PROBA 2 satellite at moderate activity (2010). The measured attenuation profiles and the retrieved linear extinction coefficients at the heights 200-500 km are compared with simulations by the NRLMSIS-00 and DTM2013 atmospheric models. It was shown that the results of simulations by the DTM2013 model are well agreed with the data of measurements at all stages of solar activity and in presence of the geomagnetic storm, whereas the results of the NRLMSISE-00 model significantly diverge from the measurements, in particular, at high and low activity. The research leading to these results has received funding from the European Union’s Seventh Programme for Research, Technological Development and Demonstration under Grant Agreement “eHeroes” (project No.284461, www.eheroes.eu).

  13. The EUV-observatory TESIS on board Coronas-Photon: scientific goals and initial plan of observations

    Science.gov (United States)

    Bogachev, Sergey

    The TESIS a EUV-observatory for solar research from space will be launched in 2008 September on board the satellite Coronas-Photon from cosmodrome Plesetsk. TESIS is a project of Lebedev Physical Institute of Russian Academy of Science with contribution from Space Research Center of Polish Academy of Science (the spectrometer SphinX). The experiment will focus on quasi-monochromatic imaging of the Sun and XUV spectroscopy of solar plasma. The scientific payload of TESIS contains five instruments: (1) Bragg crystal spectroheliometer for Sun monochromatic imaging in the line MgXII 8.42 A, (2) the normal-incidence Herschelian EUV telescopes with a resolution of 1.7 arc sec operated in lines FeXXII 133 A, FeIX 171 A and HeII 304 A, (3) the EUV imaging spectrometer, (4) the wide-field Ritchey-Chretien coronograph and (5) the X-ray spectrometer SphinX. The TESIS will focus on coordinated study of solar activity from the transition region to the outer corona up to 4 solar radii in wide temperature range from 5*104 to 2*107 K. We describe the scientific goals of the TESIS and its initial plan of observations.

  14. Solar wind- and EUV-dependent models for the shapes of the Martian plasma boundaries based on Mars Express measurements

    Science.gov (United States)

    Ramstad, Robin; Barabash, Stas; Futaana, Yoshifumi; Holmström, Mats

    2017-07-01

    The long operational life (2003-present) of Mars Express (MEX) has allowed the spacecraft to make plasma measurements in the Martian environment over a wide range of upstream conditions. We have analyzed ˜7000 MEX orbits, covering three orders of magnitude in solar wind dynamic pressure, with data from the on board Analyzer of Space Plasmas and Energetic Particles (ASPERA-3) package, mapping the locations where MEX crosses the main plasma boundaries, induced magnetosphere boundary (IMB), ionosphere boundary (IB), and bow shock (BS). A coincidence scheme was employed, where data from the Ion Mass Analyzer (IMA) and the Electron Spectrometer (ELS) had to agree for a positive boundary identification, which resulted in crossings from 1083 orbit segments that were used to create dynamic two-parameter (solar wind density, nsw, and velocity vsw) dependent global dynamic models for the IMB, IB, and BS. The modeled response is found to be individual to each boundary. The IMB scales mainly dependent on solar wind dynamic pressure and EUV intensity. The BS location closely follows the location of the IMB at the subsolar point, though under extremely low nsw and vsw the BS assumes a more oblique shape. The IB closely follows the IMB on the dayside and changes its nightside morphology with different trends for nsw and vsw. We also investigate the influence of extreme ultraviolet (EUV) radiation on the IMB and BS, finding that increased EUV intensity expands both boundaries.

  15. Experimental and theoretical study on emission spectra of a nitrogen photoionized plasma induced by intense EUV pulses

    Directory of Open Access Journals (Sweden)

    Saber Ismail

    2018-01-01

    Full Text Available Spectral lines of low-temperature nitrogen photoionized plasma were investigated. The photoionized plasma was created in the result of irradiation N2 gas using laser plasma EUV radiation pulses. The source was based on a 10J/10ns Nd:YAG (λ = 1064 nm laser system and a gas puff target. The EUV radiation pulses were collected and focused using a grazing incidence multifoil EUV collector. The emission spectra were measured in the ultraviolet and visible (UV/Vis range. It was found that the plasma emission lines in the lower region of the UV range are relativley weak. Nonetheless, a part of the spectra contains strong molecular band in the 300 - 430 nm originated from second positive and first negative systems band transitions of nitrogen. These molecular band transitions were identified using a code for study the diatomic molecules, LIFBASE. The vibrational band of Δv = 0 and ±1 transitions were significantly populated than of that with Δv = ±2 and 3 transitions. A comparison of the calculated and measured spectrum is presented. With an assumption of a local thermodynamic equilibrium (LTE, the vibrational temperature was determined from the integrated band intensities with the help of the Boltzmann plot method and compared to the temperature predicted by SPECAIR and LIFBASE simulations. A summary of the results and the variations in the vibrational temperatures was discussed.

  16. Measuring Solar Doppler Velocities in the He II 30.38 nm Emission Using the EUV Variability Experiment (EVE)

    Science.gov (United States)

    Chamberlin, Phillip Clyde

    2016-01-01

    The EUV Variability Experiment (EVE) onboard the Solar Dynamics Observatory has provided unprecedented measurements of the solar EUV irradiance at high temporal cadence with good spectral resolution and range since May 2010. The main purpose of EVE was to connect the Sun to the Earth by providing measurements of the EUV irradianceas a driver for space weather and Living With a Star studies, but after launch the instrument has demonstrated the significance of its measurements in contributing to studies looking at the sources of solar variability for pure solar physics purposes. This paper expands upon previous findings that EVE can in fact measure wavelength shifts during solar eruptive events and therefore provide Doppler velocities for plasma at all temperatures throughout the solar atmosphere from the chromosphere to hot flaring temperatures. This process is not straightforward as EVE was not designed or optimized for these types of measurements. In this paper we describe the many detailed instrumental characterizations needed to eliminate the optical effects in order to provide an absolute baseline for the Doppler shift studies. An example is given of a solar eruption on 7 September 2011 (SOL2011-09-07), associated with an X1.2 flare, where EVE Doppler analysis shows plasma ejected from the Sun in the He II 30.38 nm emission at a velocity of almost 120 km s(exp -1) along the line-of-sight.

  17. CORONAL MAGNETIC FIELDS DERIVED FROM SIMULTANEOUS MICROWAVE AND EUV OBSERVATIONS AND COMPARISON WITH THE POTENTIAL FIELD MODEL

    Energy Technology Data Exchange (ETDEWEB)

    Miyawaki, Shun; Nozawa, Satoshi [Department of Science, Ibaraki University, Mito, Ibaraki 310-8512 (Japan); Iwai, Kazumasa; Shibasaki, Kiyoto [Nobeyama Solar Radio Observatory, National Astronomical Observatory of Japan, Minamimaki, Nagano 384-1305 (Japan); Shiota, Daikou, E-mail: shunmi089@gmail.com [Solar-Terrestrial Environment Laboratory, Nagoya University, Nagoya, Aichi 464-8601 (Japan)

    2016-02-10

    We estimated the accuracy of coronal magnetic fields derived from radio observations by comparing them to potential field calculations and the differential emission measure measurements using EUV observations. We derived line-of-sight components of the coronal magnetic field from polarization observations of the thermal bremsstrahlung in the NOAA active region 11150, observed around 3:00 UT on 2011 February 3 using the Nobeyama Radioheliograph at 17 GHz. Because the thermal bremsstrahlung intensity at 17 GHz includes both chromospheric and coronal components, we extracted only the coronal component by measuring the coronal emission measure in EUV observations. In addition, we derived only the radio polarization component of the corona by selecting the region of coronal loops and weak magnetic field strength in the chromosphere along the line of sight. The upper limits of the coronal longitudinal magnetic fields were determined as 100–210 G. We also calculated the coronal longitudinal magnetic fields from the potential field extrapolation using the photospheric magnetic field obtained from the Helioseismic and Magnetic Imager. However, the calculated potential fields were certainly smaller than the observed coronal longitudinal magnetic field. This discrepancy between the potential and the observed magnetic field strengths can be explained consistently by two reasons: (1) the underestimation of the coronal emission measure resulting from the limitation of the temperature range of the EUV observations, and (2) the underestimation of the coronal magnetic field resulting from the potential field assumption.

  18. Experimental and theoretical study on emission spectra of a nitrogen photoionized plasma induced by intense EUV pulses

    Science.gov (United States)

    Saber, Ismail; Bartnik, Andrzej; Skrzeczanowski, Wojciech; Wachulak, Przemyslaw; Jarocki, Roman; Fiedorowicz, Henryk; Limpouch, Jiri

    2018-01-01

    Spectral lines of low-temperature nitrogen photoionized plasma were investigated. The photoionized plasma was created in the result of irradiation N2 gas using laser plasma EUV radiation pulses. The source was based on a 10J/10ns Nd:YAG (λ = 1064 nm) laser system and a gas puff target. The EUV radiation pulses were collected and focused using a grazing incidence multifoil EUV collector. The emission spectra were measured in the ultraviolet and visible (UV/Vis) range. It was found that the plasma emission lines in the lower region of the UV range are relativley weak. Nonetheless, a part of the spectra contains strong molecular band in the 300 - 430 nm originated from second positive and first negative systems band transitions of nitrogen. These molecular band transitions were identified using a code for study the diatomic molecules, LIFBASE. The vibrational band of Δv = 0 and ±1 transitions were significantly populated than of that with Δv = ±2 and 3 transitions. A comparison of the calculated and measured spectrum is presented. With an assumption of a local thermodynamic equilibrium (LTE), the vibrational temperature was determined from the integrated band intensities with the help of the Boltzmann plot method and compared to the temperature predicted by SPECAIR and LIFBASE simulations. A summary of the results and the variations in the vibrational temperatures was discussed.

  19. Combined effects of pre-pulsing and target geometry on efficient EUV production from laser produced plasma experiments and modeling

    Science.gov (United States)

    Hassanein, A.; Sizyuk, T.; Sizyuk, V.; Harilal, S. S.

    2011-04-01

    Laser produced plasmas (LPP) is currently a promising source of an efficient extreme ultraviolet (EUV) photon source production for advanced lithography. Optimum laser pulse parameters with adjusted wavelength, energy, and duration for simple planar or spherical tin target can provide 2-3% conversion efficiency (CE) in laboratory experiments. These values are also in good agreement with modeling results. Additional effects such as targets with complex geometry and tin-doped targets using pre-pulsing of laser beams can significantly increase CE. Recent studies showed that such improvements in LPP system are due to reduction in laser energy losses by decreasing photons transmission (higher harmonic of Nd:YAG laser) or photons reflection (for CO2 laser). Optimization of target heating using pre-pulses or ablating low-density and nanoporous tin oxide can further improve LLP sources by creating more efficient plasma plumes and as a result increasing CE, the most important parameter for EUV sources. The second important challenge in developing LPP devices is to decrease fast ions and target debris to protect the optical collection system and increase its lifetime. We investigated the combined effects of pre-pulsing with various parameters and different target geometries on EUV conversion efficiency and on energetic ions production. The much higher reflectivity of CO2 laser from a tin target leads to two possible ways for system improvement using pre-pulses with shorter laser wavelengths or using more complex targets geometries with special grooves as developed previously by the authors.

  20. Evolution analysis of EUV radiation from laser-produced tin plasmas based on a radiation hydrodynamics model.

    Science.gov (United States)

    Su, M G; Min, Q; Cao, S Q; Sun, D X; Hayden, P; O'Sullivan, G; Dong, C Z

    2017-03-23

    One of fundamental aims of extreme ultraviolet (EUV) lithography is to maximize brightness or conversion efficiency of laser energy to radiation at specific wavelengths from laser produced plasmas (LPPs) of specific elements for matching to available multilayer optical systems. Tin LPPs have been chosen for operation at a wavelength of 13.5 nm. For an investigation of EUV radiation of laser-produced tin plasmas, it is crucial to study the related atomic processes and their evolution so as to reliably predict the optimum plasma and experimental conditions. Here, we present a simplified radiation hydrodynamic model based on the fluid dynamic equations and the radiative transfer equation to rapidly investigate the evolution of radiation properties and dynamics in laser-produced tin plasmas. The self-absorption features of EUV spectra measured at an angle of 45° to the direction of plasma expansion have been successfully simulated and explained, and the evolution of some parameters, such as the plasma temperature, ion distribution and density, expansion size and velocity, have also been evaluated. Our results should be useful for further understanding of current research on extreme ultraviolet and soft X-ray source development for applications such as lithography, metrology and biological imaging.

  1. Project Based Learning in English for Specific Purposes (ESP) Course for Pre-Service Teacher

    OpenAIRE

    Indrasari, Nunun

    2016-01-01

    This paper attempts to explore the benefits and how Project Based Learning (PBL) is actually applied in ESP course. It also aims to investigate the problems arising in ESP course for pre-service teachers in English Education in IAIN Raden Intan Lampung. Teaching ESP course should cover both theoretically and practically. Pre-service teachers in IAIN Raden Intan Lampung tend to understand the theory but have no idea in applying it in real situation. PBL can be an alternative in teaching ESP co...

  2. QUALITATIVE INDICATORS OF EFFICIENCY OF TECHNOLOGIES DEVELOPING ESP COMPETENCE IN STUDENTS MAJORING IN SCIENCES

    Directory of Open Access Journals (Sweden)

    Наталія Микитинко

    2015-05-01

    Full Text Available The article is dedicated to identifying and diagnosing qualitative indicators of efficiency of technologies developing ESP competence in students majoring in Sciences, namely: indicators of objective and subjective assessment  of students’ ESP competence, students’ motivation regarding professional choice, organizational features of professional training, its contents, the most popular learning activities, use of active methods of study in educational process. The paradigm of experimental research of efficiency of technologies developing ESP competence in students majoring in Sciences has been defined. Based on the interpretation of the qualitative indicators the hypothesis of efficiency of technologies developing ESP competence in students majoring in Sciences has been proven.

  3. ESP [electric submersible pump] performance in sand-laden fluids in the Bellshill Lake field

    Energy Technology Data Exchange (ETDEWEB)

    Dowhaniuk, W. (Petro-Canada Resources, Killam, AB (Canada))

    1992-06-01

    Electric submersible pumps (ESPs) used by Petro-Canada in the Bellshill Lake basal quartz pool, were first used as a means of high volume lift in 1976. Traditionally used in areas of the reservoir with limited sand production, ESPs were run in the more permeable and porous areas of the reservoir consisting mainly of unconsolidated sandstones in 1987. Reservoir inflow and sand production was prolific, and ESPs in these wells typically ran for 2-3 days before catastrophic failure occurred, due to the high concentration of abrasives in the produced fluids. As a result of the failures a study was carried out to identify the problems associated with ESPs and abrasives and to determine economic solutions. As a result of the study, the following measures were implemented to improve the service lives of ESPs in the field. All wells that are converted to ESPs are reperforated at 39 shots/m to reduce the pressure drop across the perforations and thus reduce the inflow of sand. New and rebuilt ESPs are assembled without the conventional brass sleeves, instead using Ni-resist parts to avoid hydrogen sulfide attack and degradation. Rubber bearing radially stabilized design counteracts the effect of sand-laden fluid, and drawdown is limited for the first 2-4 weeks of production. Current ESP run-times range up to 2.5 years, and no rubber bearing ESPs have failed due to sand production. 8 refs., 10 figs.

  4. SEP ionic charge states in ESP and impulsive events

    Science.gov (United States)

    Popecki, M.; Moebius, E.; Galvin, A.; Kistler, L.; Kucharek, H.; Klecker, B.

    The SEPICA instrument on the Advanced Composition Explorer (ACE) spacecraft has measured ionic charge states of solar energetic particles (SEPs) from late 1997 through 2000. Charge state measurements provide insights about the acceleration and propa- gation history of SEPs. In impulsive events, SEP charge states provide information about the flare environment, where source heating and collisions are important. In in- terplanetary shock events, SEP charge states are diagnostics of the rigidity-dependent acceleration process and particle seed populations. For example, 3He enrichment has been observed in some events with a local shock passage (Desai et al., 2001). An en- hancement in high charge state Fe has also been observed in these events (Popecki et al., 2001). This suggests that the seed population for the interplanetary shock con- tained ions previously accelerated in flares. SEP charge states from impulsive events will be compared to those from events with a local shock passage (ESP events). In addition, the ESP events wil be separated into those with and without 3He enrichment. Results will be presented in the context of mission-integrated ionic charge state distributions for each species.

  5. A Bayes factor meta-analysis of Bem's ESP claim.

    Science.gov (United States)

    Rouder, Jeffrey N; Morey, Richard D

    2011-08-01

    In recent years, statisticians and psychologists have provided the critique that p-values do not capture the evidence afforded by data and are, consequently, ill suited for analysis in scientific endeavors. The issue is particular salient in the assessment of the recent evidence provided for ESP by Bem (2011) in the mainstream Journal of Personality and Social Psychology. Wagenmakers, Wetzels, Borsboom, and van der Maas (Journal of Personality and Social Psychology, 100, 426-432, 2011) have provided an alternative Bayes factor assessment of Bem's data, but their assessment was limited to examining each experiment in isolation. We show here that the variant of the Bayes factor employed by Wagenmakers et al. is inappropriate for making assessments across multiple experiments, and cannot be used to gain an accurate assessment of the total evidence in Bem's data. We develop a meta-analytic Bayes factor that describes how researchers should update their prior beliefs about the odds of hypotheses in light of data across several experiments. We find that the evidence that people can feel the future with neutral and erotic stimuli to be slight, with Bayes factors of 3.23 and 1.57, respectively. There is some evidence, however, for the hypothesis that people can feel the future with emotionally valenced nonerotic stimuli, with a Bayes factor of about 40. Although this value is certainly noteworthy, we believe it is orders of magnitude lower than what is required to overcome appropriate skepticism of ESP.

  6. A new colorimetric DPPH• scavenging activity method with no need for a spectrophotometer applied on synthetic and natural antioxidants and medicinal herbs.

    Science.gov (United States)

    Akar, Zeynep; Küçük, Murat; Doğan, Hacer

    2017-12-01

    2,2-Diphenyl-1-picrylhydrazyl (DPPH•) radical scavenging, the most commonly used antioxidant method with more than seventeen thousand articles cited, is very practical; however, as with most assays, it has the major disadvantage of dependence on a spectrophotometer. To overcome this drawback, the colorimetric determination of the antioxidant activity using a scanner and freely available Image J software was developed. In this new method, the mixtures of solutions of DPPH• and standard antioxidants or extracts of common medicinal herbs were dropped onto TLC plates, after an incubation period. The spot images were evaluated with Image J software to determine CSC50 values, the sample concentrations providing 50% colour reduction, which were very similar with the SC50 values obtained with spectrophotometric method. The advantages of the new method are the use of lower amounts of reagents and solvents, no need for costly spectrophotometers, and thus significantly lowered costs, and convenient implementation in any environment and situation.

  7. Ground-based intercomparisons of SBUV/2 flight instruments the world standard Dobson spectrophotometer 83 and overpass observations from Nimbus-7 TOMS and NOAA-11 SBUV/2

    Science.gov (United States)

    Heath, D. F.; Ahmad, Z.; Torres, O.; Evans, R. D.; Grass, R. D.; Komhyr, W. A.; Nelson, W.

    1994-01-01

    Total ozone data obtained during summers at Mauna Loa Observatory, Hawaii, with Dobson Spectrophotometer 83 are routinely compared with overpass total ozone data from the Total Ozone Mapping Spectrometer (TOMS) and the Solar Backscatter Ultraviolet (SBUV) spectrometer launched aboard the Nimbus 7 satellite in 1978. Results from the TOMS/Dobson instrument comparisons through 1990 have been presented by McPeters and Komhyr (1991). Dobson spectrophotometer 83 was established as the standard instrument for the U.S.A. Dobson instrument station network in 1962. In 1980, the instrument was designated by the World Meteorological Organization (WMO) as the Standard Dobson Spectrophotometer for the World. Long-term ozone measurement precision of the instrument has been maintained at plus or minus 0.5 percent (Komhyr et al., 1989). On an absolute scale, the ozone measurement accuracy of the instrument is estimated to plus or minus 3 percent. In early April, 1990, comparison of total ozone and vertical distribution (Umkehr) observations were made for the first time with Dobson spectrophotometer 8.3. The work was conducted at the NOAA Climate Monitoring and Diagnostics Laboratory (CMDL) in Boulder, Colorado, and at the research and instrument manufacturing facility of the Ball Aerospace System Division located about 2 km east of Boulder. (The SBUV-2 S/N-2 instrument, built by Ball Aerospace Systems Division, is scheduled for launch aboard the NOAA-13 satellite). We present results of the comparisons which include ozone vertical distribution data obtained with a balloon-borne electrochemical concentration cell (ECC) ozonesonde (Komhyr, 1969).

  8. An in-line spectrophotometer on a centrifugal microfluidic platform for real-time protein determination and calibration.

    Science.gov (United States)

    Ding, Zhaoxiong; Zhang, Dongying; Wang, Guanghui; Tang, Minghui; Dong, Yumin; Zhang, Yixin; Ho, Ho-Pui; Zhang, Xuping

    2016-09-21

    In this paper, an in-line, low-cost, miniature and portable spectrophotometric detection system is presented and used for fast protein determination and calibration in centrifugal microfluidics. Our portable detection system is configured with paired emitter and detector diodes (PEDD), where the light beam between both LEDs is collimated with enhanced system tolerance. It is the first time that a physical model of PEDD is clearly presented, which could be modelled as a photosensitive RC oscillator. A portable centrifugal microfluidic system that contains a wireless port in real-time communication with a smartphone has been built to show that PEDD is an effective strategy for conducting rapid protein bioassays with detection performance comparable to that of a UV-vis spectrophotometer. The choice of centrifugal microfluidics offers the unique benefits of highly parallel fluidic actuation at high accuracy while there is no need for a pump, as inertial forces are present within the entire spinning disc and accurately controlled by varying the spinning speed. As a demonstration experiment, we have conducted the Bradford assay for bovine serum albumin (BSA) concentration calibration from 0 to 2 mg mL(-1). Moreover, a novel centrifugal disc with a spiral microchannel is proposed for automatic distribution and metering of the sample to all the parallel reactions at one time. The reported lab-on-a-disc scheme with PEDD detection may offer a solution for high-throughput assays, such as protein density calibration, drug screening and drug solubility measurement that require the handling of a large number of reactions in parallel.

  9. Image-based ELISA on an activated polypropylene microtest plate--a spectrophotometer-free low cost assay technique.

    Science.gov (United States)

    Parween, Shahila; Nahar, Pradip

    2013-10-15

    In this communication, we report ELISA technique on an activated polypropylene microtest plate (APPµTP) as an illustrative example of a low cost diagnostic assay. Activated test zone in APPµTP binds a capture biomolecule through covalent linkage thereby, eliminating non-specific binding often prevalent in absorption based techniques. Efficacy of APPµTP is demonstrated by detecting human immunoglobulin G (IgG), human immunoglobulin E (IgE) and Aspergillus fumigatus antibody in patient's sera. Detection is done by taking the image of the assay solution by a desktop scanner and analyzing the color of the image. Human IgE quantification by color saturation in the image-based assay shows excellent correlation with absorbance-based assay (Pearson correlation coefficient, r=0.992). Significance of the relationship is seen from its p value which is 4.087e-11. Performance of APPµTP is also checked with respect to microtiter plate and paper-based ELISA. APPµTP can quantify an analyte as precisely as in microtiter plate with insignificant non-specific binding, a necessary prerequisite for ELISA assay. In contrast, paper-ELISA shows high non-specific binding in control sera (false positive). Finally, we have carried out ELISA steps on APPµTP by ultrasound waves on a sonicator bath and the results show that even in 8 min, it can convincingly differentiate a test sample from a control sample. In short, spectrophotometer-free image-based miniaturized ELISA on APPµTP is precise, reliable, rapid, and sensitive and could be a good substitute for conventional immunoassay procedures widely used in clinical and research laboratories. Copyright © 2013 Elsevier B.V. All rights reserved.

  10. Improved fiberoptic spectrophotometer

    Science.gov (United States)

    Tans, P.P.; Lashof, D.A.

    1985-04-02

    The present invention allows for accurate spectrophotmetric comparison of the Raman scattering from a sample gas with the Raman scattering from a known gas via a novel fiber optic network. The need for complicated electronic of optical circuit balancing, control, or error compensation circuitry is eliminated. The laser cavity is split into two regions, one of which houses the plasma discharge and produces laser power, and the other of which is adapted to house tubes containing the gas samples. Light from the laser source is beamed simultaneously through samples of the reference gas and the unknown gas, and Raman-scattered light is emitted. The Raman-scattered light from the known and unknown mixtures is then alternately passed through a fiber optic network where the various wavelengths are spatially mixed. The mixed light is then passed into a system of light detectors, each of which are adapted to measure one of the wavelengths of light representing a constituent element of the gases. When the test is complete, each gas sample can be assigned a Raman-scattered profile from the data consisting of the ratios each of the constituent elements bear to each other. (LEW)

  11. Growth condition-dependent Esp expression by Enterococcus faecium affects initial adherence and biofilm formation.

    Science.gov (United States)

    Van Wamel, Willem J B; Hendrickx, Antoni P A; Bonten, Marc J M; Top, Janetta; Posthuma, George; Willems, Rob J L

    2007-02-01

    A genetic subpopulation of Enterococcus faecium, called clonal complex 17 (CC-17), is strongly associated with hospital outbreaks and invasive infections. Most CC-17 strains contain a putative pathogenicity island encoding the E. faecium variant of enterococcal surface protein (Esp). Western blotting, flow cytometric analyses, and electron microscopy showed that Esp is expressed and exposed on the surface of E. faecium, though Esp expression and surface exposure are highly varied among different strains. Furthermore, Esp expression depends on growth conditions like temperature and anaerobioses. When grown at 37 degrees C, five of six esp-positive E. faecium strains showed significantly increased levels of surface-exposed Esp compared to bacteria grown at 21 degrees C, which was confirmed at the transcriptional level by real-time PCR. In addition, a significant increase in surface-exposed Esp was found in half of these strains when grown at 37 degrees C under anaerobic conditions compared to the level in bacteria grown under aerobic conditions. Finally, amounts of surface-exposed Esp correlated with initial adherence to polystyrene (R(2) = 0.7146) and biofilm formation (R(2) = 0.7535). Polystyrene adherence was competitively inhibited by soluble recombinant N-terminal Esp. This study demonstrates that Esp expression on the surface of E. faecium (i) varies consistently between strains, (ii) is growth condition dependent, and (iii) is quantitatively correlated with initial adherence and biofilm formation. These data indicate that E. faecium senses and responds to changing environmental conditions, which might play a role in the early stages of infection when bacteria transit from oxygen-rich conditions at room temperature to anaerobic conditions at body temperature. In addition, variation of surface exposure may explain the contrasting findings reported on the role of Esp in biofilm formation.

  12. Empirical and accurate method for the three-dimensional electrostatic potential (EM-ESP) of biomolecules.

    Science.gov (United States)

    Du, Qi-Shi; Wang, Cheng-Hua; Wang, Yu-Ting; Huang, Ri-Bo

    2010-04-01

    The electrostatic potential (ESP) is an important property of interactions within and between macromolecules, including those of importance in the life sciences. Semiempirical quantum chemical methods and classical Coulomb calculations fail to provide even qualitative ESP for many of these biomolecules. A new empirical ESP calculation method, namely, EM-ESP, is developed in this study, in which the traditional approach of point atomic charges and the classical Coulomb equation is discarded. In its place, the EM-ESP generates a three-dimensional electrostatic potential V(EM)(r) in molecular space that is the sum of contributions from all component atoms. The contribution of an atom k is formulated as a Gaussian function g(r(k);alpha(k),beta(k)) = alpha(k)/r(k)(betak) with two parameters (alpha(k) and beta(k)). The benchmark for the parameter optimization is the ESP obtained by using higher-level quantum chemical approaches (e.g., CCSD/TZVP). A set of atom-based parameters is optimized in a training set of common organic molecules. Calculated examples demonstrate that the EM-ESP approach is a vast improvement over the Coulombic approach in producing the molecular ESP contours that are comparable to the results obtained with higher-level quantum chemical methods. The atom-based parameters are shown to be transferrable between one part of closely related aromatic molecules. The atom-based ESP formulization and parametrization strategy can be extended to biological macromolecules, such as proteins, DNA, and RNA molecules. Since ESP is frequently used to rationalize and predict intermolecular interactions, we expect that the EM-ESP method will have important applications for studies of protein-ligand and protein-protein interactions in numerous areas of chemistry, molecular biology, and other life sciences.

  13. Atomic structure calculations and identification of EUV and SXR spectral lines in Sr XXX

    Science.gov (United States)

    Goyal, Arun; Khatri, Indu; Aggarwal, Sunny; Singh, A. K.; Mohan, Man

    2015-08-01

    We report an extensive theoretical study of atomic data for Sr XXX in a wide range with L-shell electron excitations to the M-shell. We have calculated energy levels, wave-function compositions and lifetimes for lowest 113 fine structure levels and wavelengths of an extreme Ultraviolet (EUV) and soft X-ray (SXR) transitions. We have employed multi-configuration Dirac Fock method (MCDF) approach within the framework of Dirac-Coulomb Hamiltonian including quantum electrodynamics (QED) and Breit corrections. We have also presented the radiative data for electric and magnetic dipole (E1, M1) and quadrupole (E2, M2) transitions from the ground state. We have made comparisons with available energy levels compiled by NIST and achieve good agreement. But due to inadequate data in the literature, analogous relativistic distorted wave calculations have also been performed using flexible atomic code (FAC) to assess the reliability and accuracy of our results. Additionally, we have provided new atomic data for Sr XXX which is not published elsewhere in the literature and we believe that our results may be beneficial in fusion plasma research and astrophysical investigations and applications.

  14. Closed coronal structures. III - Comparison of static models with X-ray, EUV, and radio observations

    Science.gov (United States)

    Pallavicini, R.; Peres, G.; Serio, S.; Vaiana, G. S.; Golub, L.; Rosner, R.

    1981-01-01

    Numerical models of static coronal loops in energy balance are compared with high spatial resolution observations of extreme ultraviolet lines, broad-band X-ray emission, and interferometric observations at 2.8 cm of a solar active region. Difficulties of using scaling laws to test static models of coronal loops are reviewed. The theoretical model used for the comparison is summarized; the detailed X-ray, EUV, and microwave observations of the selected active region are presented; and the comparison of the model with the observations is performed. It is shown that simple static models with conductive flux vanishing at the loop base reproduce satisfactorily the observed properties in the upper portion of loop structures from compact, high-pressure loops in the core of the region to more extended, fainter loops and to large-scale loops interconnecting different active regions. Effects of changing loop parameters are investigated, and it is argued, that in contrast to the present approach, scaling laws cannot be used to discriminate between different static energy balance models. Some discrepancy is found between model predictions and observations for the lower sections of loop structures. Possible causes of the discrepancy are discussed.

  15. Laboratory Calibration of Density-Dependent Lines in the EUV and Soft X-Ray Regions

    Energy Technology Data Exchange (ETDEWEB)

    Lepson, J K; Beiersdorfer, P; Gu, M F; Desai, P

    2010-12-09

    We analyzed spectral data of Fe XXII and Ar XIV from laboratory sources in which the electron density varies by several orders of magnitude to help benchmark density-sensitive emission lines useful for astrophysics and to test the atomic models underlying the diagnostic line ratios. We found excellent agreement for Fe XXII, but poorer agreement for Ar XIV. A number of astrophysically important emission lines are sensitive to electron density in the EUV and soft X-ray regions. Lines from Fe XXII, for example, have been used in recent years as diagnostics of stellar coronae, such as the active variable AB Dor, Capella, and EX Hya (Sanz-Forcada et al. 2003, Mewe et al. 2001, Mauche et al. 2003). Here we report spectral data of Fe XXII and Ar XIV from laboratory sources in which the electron density is known from either K-shell density diagnostics (for electron beam ion traps) or from non-spectroscopic means (tokamaks), ranging from 5 x 10{sup 10} cm{sup -3} to 5 x 10{sup 14} cm{sup -3}. These measurements were used to test the atomic data underlying the density diagnostic line ratios, complementing earlier work (Chen et al. 2004).

  16. Scrape-off-layer current and EUV diagnostics and control on the HBT-EP tokamak

    Science.gov (United States)

    Levesque, J. P.; Mauel, M. E.; Bialek, J.; Navratil, G. A.; Delgado-Aparicio, L.; Hansen, C. J.

    2015-11-01

    Non-axisymmetric currents in the scrape-off-layer (SOL) and conducting structure of a tokamak can produce severe forces at high plasma performance, compromising the device's structural integrity. Diagnosing these currents during disruptions is important for extrapolating forces in future machines including ITER. Progress on designing components to measure and control SOL and vessel currents in the HBT-EP tokamak is presented. Movable tiles positioned around limiting surfaces will measure SOL and vessel currents during mode activity and disruptions. Biasable plates at divertor strike points will allow control of field-aligned SOL currents for kink mode control studies and will drive convection in the plasma edge. In-vessel Rogowski coils will measure currents in wall components with high spatial resolution. A planned EUV diagnostic upgrade is also presented. Four sets of 16 poloidal views will allow tomographic reconstruction of plasma emissivity and internal kink mode structure. A separate two-color, 16-chord tangential system will allow reconstruction of temperature profiles versus time. Measurements will be input to HBT-EP's GPU-based feedback system, providing active feedback for kink modes using only optical sensors and both magnetic and edge current actuators. Supported by U.S. DOE Grant DE-FG02-86ER53222.

  17. Heating Mechanisms for Intermittent Loops in Active Region Cores from AIA/SDO EUV Observations

    Science.gov (United States)

    Cadavid, A. C.; Lawrence, J. K.; Christian, D. J.; Jess, D. B.; Nigro, G.

    2014-11-01

    We investigate intensity variations and energy deposition in five coronal loops in active region cores. These were selected for their strong variability in the AIA/SDO 94 Å intensity channel. We isolate the hot Fe XVIII and Fe XXI components of the 94 Å and 131 Å by modeling and subtracting the "warm" contributions to the emission. HMI/SDO data allow us to focus on "inter-moss" regions in the loops. The detailed evolution of the inter-moss intensity time series reveals loops that are impulsively heated in a mode compatible with a nanoflare storm, with a spike in the hot 131 Å signals leading and the other five EUV emission channels following in progressive cooling order. A sharp increase in electron temperature tends to follow closely after the hot 131 Å signal confirming the impulsive nature of the process. A cooler process of growing emission measure follows more slowly. The Fourier power spectra of the hot 131 Å signals, when averaged over the five loops, present three scaling regimes with break frequencies near 0.1 min-1 and 0.7 min-1. The low frequency regime corresponds to 1/f noise; the intermediate indicates a persistent scaling process and the high frequencies show white noise. Very similar results are found for the energy dissipation in a 2D "hybrid" shell model of loop magneto-turbulence, based on reduced magnetohydrodynamics, that is compatible with nanoflare statistics. We suggest that such turbulent dissipation is the energy source for our loops.

  18. Center-to-Limb Variability of Hot Coronal EUV Emissions During Solar Flares

    Science.gov (United States)

    Thiemann, E. M. B.; Chamberlin, P. C.; Eparvier, F. G.; Epp, L.

    2018-02-01

    It is generally accepted that densities of quiet-Sun and active region plasma are sufficiently low to justify the optically thin approximation, and this is commonly used in the analysis of line emissions from plasma in the solar corona. However, the densities of solar flare loops are substantially higher, compromising the optically thin approximation. This study begins with a radiative transfer model that uses typical solar flare densities and geometries to show that hot coronal emission lines are not generally optically thin. Furthermore, the model demonstrates that the observed line intensity should exhibit center-to-limb variability (CTLV), with flares observed near the limb being dimmer than those occurring near disk center. The model predictions are validated with an analysis of over 200 flares observed by the EUV Variability Experiment (EVE) on the Solar Dynamics Observatory (SDO), which uses six lines, with peak formation temperatures between 8.9 and 15.8 MK, to show that limb flares are systematically dimmer than disk-center flares. The data are then used to show that the electron column density along the line of sight typically increases by 1.76 × 10^{19} cm^{-2} for limb flares over the disk-center flare value. It is shown that the CTLV of hot coronal emissions reduces the amount of ionizing radiation propagating into the solar system, and it changes the relative intensities of lines and bands commonly used for spectral analysis.

  19. Combined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures.

    Science.gov (United States)

    Yakunin, S N; Makhotkin, I A; Nikolaev, K V; van de Kruijs, R W E; Chuev, M A; Bijkerk, F

    2014-08-25

    We present a way to analyze the chemical composition of periodical multilayer structures using the simultaneous analysis of grazing incidence hard X-Ray reflectivity (GIXR) and normal incidence extreme ultraviolet reflectance (EUVR). This allows to combine the high sensitivity of GIXR data to layer and interface thicknesses with the sensitivity of EUVR to the layer densities and atomic compositions. This method was applied to the reconstruction of the layered structure of a LaN/B multilayer mirror with 3.5 nm periodicity. We have compared profiles obtained by simultaneous EUVR and GIXR and GIXR-only data analysis, both reconstructed profiles result in a similar description of the layered structure. However, the simultaneous analysis of both EUVR and GIXR by a single algorithm lead to a ∼ 2x increased accuracy of the reconstructed layered model, or a more narrow range of solutions, as compared to the GIXR analysis only. It also explains the inherent difficulty of accurately predicting EUV reflectivity from a GIXR-only analysis.

  20. Electron-impact induced fluorescence for EUV spectrometer-detector calibration

    Energy Technology Data Exchange (ETDEWEB)

    Knie, Andre, E-mail: knie@physik.uni-kassel.de [University of Kassel, Center for Interdisciplinary Nanostructure Science and Technology - CINSaT Heinrich-Plett-Str. 40, 34132 Kassel (Germany); Burbank, Nils; Schmidt, Philipp; Ozga, Christian; Ehresmann, Arno [University of Kassel, Center for Interdisciplinary Nanostructure Science and Technology - CINSaT Heinrich-Plett-Str. 40, 34132 Kassel (Germany)

    2012-11-15

    Highlights: Black-Right-Pointing-Pointer Introducing an easy-to-handle calibration method for UV-spectrometers (165-314 nm). Black-Right-Pointing-Pointer Complete electron impact induced UV fluorescence spectra of rare gas atoms. Black-Right-Pointing-Pointer Identification of 196 new fluorescence lines not observed before. Black-Right-Pointing-Pointer Additional line catalog of 1670 lines for calculation tests and comparison. Black-Right-Pointing-Pointer New challenge for theory - observation of 183 lines not yet identifiable. -- Abstract: EUV-Spectra of electron-impact induced fluorescence from rare gases were recorded for an impact energy of 3.5 keV intending their application in the first step for spectrometer wavelength scale calibrations. The spectra are in the investigated range of 165-314 nm in good agreement with previously measured and calculated spectra. Nearly all observed lines could be identified including 196 new lines. 183 lines mainly for krypton and xenon could not be identified. The spectra are presented and discussed. A compendium of 1670 lines and their identification is added as supplementary tables. The spectra show a number of strong lines which are well suited for spectrometer wavelength scale calibrations and once their intensity relation is deduced can be used for a sensitivity determination of a spectrometer-detector combination as described in the introductory and experimental sections of the paper.