WorldWideScience

Sample records for euv source based

  1. Plasma-based EUV light source

    Science.gov (United States)

    Shumlak, Uri; Golingo, Raymond; Nelson, Brian A.

    2010-11-02

    Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

  2. Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

    Directory of Open Access Journals (Sweden)

    Junichi Fujimoto

    2012-01-01

    Full Text Available Since 2002, we have been developing a carbon dioxide (CO2 laser-produced tin (Sn plasma (LPP extreme ultraviolet (EUV light source, which is the most promising solution because of the 13.5 nm wavelength high power (>200 W light source for high volume manufacturing. EUV lithography is used for its high efficiency, power scalability, and spatial freedom around plasma. We believe that the LPP scheme is the most feasible candidate for the EUV light source for industrial use. We have several engineering data from our test tools, which include 93% Sn ionization rate, 98% Sn debris mitigation by a magnetic field, and 68% CO2 laser energy absorption rate. The way of dispersion of Sn by prepulse laser is key to improve conversion efficiency (CE. We focus on prepulsed laser pulsed duration. When we have optimized pulse duration from nanosecond to picosecond, we have obtained maximum 4.7% CE (CO2 laser to EUV; our previous data was 3.8% at 2 mJ EUV pulse energy. Based on these data we are developing our first light source as our product: “GL200E.” The latest data and the overview of EUV light source for the industrial EUV lithography are reviewed in this paper.

  3. High-performance next-generation EUV lithography light source

    Science.gov (United States)

    Choi, Peter; Zakharov, Sergey V.; Aliaga-Rossel, Raul; Benali, Otman; Duffy, Grainne; Sarroukh, Ouassima; Wyndham, Edmund; Zakharov, Vasily S.

    2009-03-01

    EUVL solution for HVM at the 22 nm node requires a high power long-term EUV source operation with hundreds of watts at the intermediate focus output. EUV mask blank and mask defects inspections require at-wavelength tools with high brightness. Theoretical analysis with a 2-D radiation MHD code Z* has been performed to address key issues in EUV plasma sources with radiation transfer. The study shows that self-absorption defines the limiting brightness of a single EUV source, which cannot meet the requirements of the HVM tool with high efficiency and is not sufficient for critical metrology applications, given the limiting etendue of the optics. It is shown that the required irradiance can be achieved by spatial multiplexing, using multiple small sources. We present here details of the study, as well as experimental results from a novel EUV light source with an intrinsic photon collector demonstrating high brightness, the i-SoCoMo concept, where an impulse micro discharge plasma source is integrated to a photon collector based on an active plasma structure. The small physical size and low etendue properties of the i-SoCoMo unit allows a large number of such sources to be put together in one physical package and be operated in a multiplexed fashion to meet necessary power requirements.

  4. Physical processes in EUV sources for microlithography

    Energy Technology Data Exchange (ETDEWEB)

    Banine, V Y; Swinkels, G H P M [ASML Netherlands B.V., De Run 6501, 5504DR Veldhoven (Netherlands); Koshelev, K N [Institute of Spectroscopy RAS (ISAN), Fizicheskaya 5, Troitsk 142190 (Russian Federation)

    2011-06-29

    The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil very high demands both technical and cost oriented. The EUVL tool operates at a wavelength of 13.5 nm, which requires the following new developments. - The light production mechanism changes from conventional lamps and lasers to relatively high-temperature emitting plasmas. - The light transport, mainly refractive for deep ultraviolet (DUV), should be reflective for EUV. - The source specifications as derived from the customer requirements on wafer throughput mean that the output EUV source power has to be hundreds of watts. This in its turn means that tens to hundreds of kilowatts of dissipated power has to be managed in a relatively small volume. - In order to keep lithography costs as low as possible, the lifetime of the components should be as long as possible and at least of the order of thousands of hours. This poses a challenge for the sources, namely how to design and manufacture components robust enough to withstand the intense environment of high heat dissipation, flows of several keV ions as well as the atomic and particular debris within the source vessel. - As with all lithography tools, the imaging requirements demand a narrow illumination bandwidth. Absorption of materials at EUV wavelengths is extreme with extinguishing lengths of the order of tens of nanometres, so the balance between high transmission and spectral purity requires careful engineering. All together, EUV lithography sources present technological challenges in various fields of physics such as plasma, optics and material science. These challenges are being tackled by the source manufacturers and investigated extensively in the research facilities around the world. An overview of the published results on the topic as well as the analyses of the physical processes behind the proposed solutions will be presented in this paper. (topical review)

  5. EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology

    Science.gov (United States)

    Stamm, U.; Kleinschmidt, J.; Gabel, K.; Hergenhan, G.; Ziener, C.; Schriever, G.; Ahmad, I.; Bolshukhin, D.; Brudermann, J.; de Bruijn, R.; Chin, T. D.; Geier, A.; Gotze, S.; Keller, A.; Korobotchko, V.; Mader, B.; Ringling, J.; Brauner, T.

    2005-05-01

    In the paper we report about the progress made at XTREME technologies in the development of EUV sources based on gas discharge produced plasma (GDPP) technologies and laser produced plasma (LPP) technologies. First prototype xenon GDPP sources of the type XTS 13-35 based on the Z-pinch principle with 35 W power in 2π sr have been integrated into micro-exposure tools from Exitech, UK. Specifications of the EUV sources and experience of integration as well as data about component and optics lifetime are presented. In the source development program for Beta exposure tools and high volume manufacturing exposure tools both tin and xenon have been investigated as fuel for the EUV sources. Development progress in porous metal cooling technology as well as pulsed power circuit design has led to GDPP sources with xenon fuel continuous operating with an output power of 200 W in 2π sr at 4500 Hz repetition rate. With tin fuel an output power of 400 W in 2π sr was obtained leaving all other conditions unaltered with respect to the xenon based source. The performance of the xenon fueled sources is sufficiently good to fulfill all requirements up to the beta tool level. For both the xenon and the tin GDPP sources detailed data about source performance are reported, including component lifetime and optics lifetime. The status of the integration of the sources with grazing incidence collector optics is discussed. Theoretical estimations of collection efficiencies are compared with experimental data to determine the loss mechanisms in the beam path. Specifically contamination issues related to tin as target material as well as debris mitigation in tin sources is addressed. As driver lasers for the LPP source research diode-pumped Nd:YAG lasers have been used to generate EUV emitting plasma. As target material xenon has been employed. Conversion efficiencies have been measured and currently the maximum conversion efficiency amounts to 1 %. The laser driver power of 1.2 kW is

  6. Consequences of high-frequency operation on EUV source efficiency

    Science.gov (United States)

    Sizyuk, Tatyana

    2017-08-01

    A potential problem of future extreme ultraviolet (EUV) sources, required for high volume manufacture regimes, can be related to the contamination of the chamber environment by products of preceding laser pulse/droplet interactions. Implementation of high, 100 kHz and higher, repetition rate of EUV sources using Sn droplets ignited with laser pulses can cause high accumulation of tin in the chamber in the form of vapor, fine mist, or fragmented clusters. In this work, the effects of the residual tin accumulation in the EUV chamber in dependence on laser parameters and mitigation system efficiency were studied. The effect of various pressures of tin vapor on the CO2 and Nd:YAG laser beam propagation and on the size, the intensity, and the resulting efficiency of the EUV sources was analyzed. The HEIGHTS 3D package was used for this analysis to study the effect of residual background pressure and spatial distribution on EUV photon emission and collection. It was found that background pressure in the range of 1-5 Pa does not significantly influence the EUV source produced by CO2 lasers. A larger volume with this pressure condition, however, can reduce the efficiency of the source. However, an optimized volume of mix with proper density could increase the efficiency of the sources produced by CO2 lasers.

  7. Physical and chemical modifications of PET surface using a laser-plasma EUV source

    Science.gov (United States)

    Bartnik, A.; Fiedorowicz, H.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Biliński, A.; Chernyayeva, O.; Sobczak, J. W.

    2010-06-01

    Extreme ultraviolet (EUV) radiation is the electromagnetic radiation ranging from vacuum ultraviolet to soft X-rays. A single EUV photon carries enough energy to ionize any atom or molecule. The penetration depth of the radiation in any material is very short, ranging from tens to hundreds nanometers. Intense EUV pulses can remove material from the surface or modify its morphology or/and chemical structure. In this work, the radiation from a laser-plasma EUV source based on a double-stream gas-puff target was used for surface modification of polyethylene terephthalate (PET). The PET samples were irradiated with the EUV pulses emitted from krypton plasma and focused with a gold-plated ellipsoidal collector. The spectrum of the focused radiation covered the wavelength range from 9 to 70 nm. The PET samples were irradiated for 1 s-2 min at a 10-Hz repetition rate. Surface morphology of polymer samples after irradiation was investigated using a scanning electron microscope. Changes in chemical surface structure of the irradiated samples were investigated using an X-ray photoelectron spectroscopy. Different kinds of surface microstructures were obtained depending on the EUV fluence in a single pulse and the total EUV fluence. XPS measurements also revealed a modification of the chemical structure.

  8. LPP EUV source readiness for NXE 3300B

    Science.gov (United States)

    Brandt, David C.; Fomenkov, Igor V.; Farrar, Nigel R.; La Fontaine, Bruno; Myers, David W.; Brown, Daniel J.; Ershov, Alex I.; Böwering, Norbert R.; Riggs, Daniel J.; Rafac, Robert J.; De Dea, Silvia; Peeters, Rudy; Meiling, Hans; Harned, Noreen; Smith, Daniel; Pirati, Alberto; Kazinczi, Robert

    2014-03-01

    Laser produced plasma (LPP) light sources have been developed as the primary approach for EUV scanner imaging of circuit features in sub-20nm devices in high volume manufacturing (HVM). This paper provides a review of development progress and readiness status for the LPP extreme-ultra-violet (EUV) source. We present the latest performance results from second generation sources, including Prepulse operation for high power, collector protection for long lifetime and low cost of ownership, and dose stability for high yield. Increased EUV power is provided by a more powerful drive laser and the use of Prepulse operation for higher conversion efficiciency. Advanced automation and controls have been developed to provide the power and energy stability performance required during production fab operation. We will also discuss lifetesting of the collector in Prepulse mode and show the ability of the debris mitigation systems to keep the collector multi-layer coating free from damage and maintain high reflectivity.

  9. Transmission grating spectrometer for broadband characterization of EUV sources

    NARCIS (Netherlands)

    Bayraktar, Muharrem; Bastiaens, Hubertus M.J.; Bruineman, C.; Vratzov, B.; Bijkerk, Frederik

    2016-01-01

    Emission from extreme ultraviolet (EUV) light sources for lithography and metrology applications needs to be maximized in a narrow wavelength band. On the other hand, these sources also emit radiation outside this wavelength band, extending into the deep ultraviolet (DUV) and visible/IR range. To

  10. Investigation of a novel discharge EUV source for microlithography

    Science.gov (United States)

    Bauer, Bruno S.; Makhin, Volodymyr; Fuelling, Stephan; Lindemuth, Irvin R.

    2006-03-01

    A plasma discharge could be an inexpensive and efficient EUV source for microlithography, if issues of brightness, lifetime, debris, repetition rate, and stability can be resolved. A novel discharge EUV source (international patent pending) is being investigated that may offer an economical solution to these issues. The novel EUV discharge seeks to efficiently assemble a hot, dense, uniform, axially stable plasma with magnetic pressure and inductive current drive, employing resonant theta-pinch-type compression of plasma confined in a magnetic mirror. This resonantly compressed mirror plasma (RCMP) source would be continuously driven by a radio frequency oscillator, to obtain an EUV conversion efficiency greater than that of sources in which the plasma is discarded after each radiation burst. An analytic calculation indicates the novel RCMP source could provide 115 W of 13.45 nm radiation in 3.3 mm2sr etendue to an intermediate focus. Numerical modeling of RCMP dynamics has been performed with MHRDR-EUVL, a magnetohydrodynamic (MHD) numerical simulation with atomic and radiation physics. The numerical simulation demonstrates the efficacy of resonant magneto-acoustic heating. An experiment is being developed to test the new concept.

  11. Laser-plasma EUV source dedicated for surface processing of polymers

    Science.gov (United States)

    Bartnik, A.; Fiedorowicz, H.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Wachulak, P. W.

    2011-08-01

    In this work, a 10 Hz laser-plasma extreme ultraviolet (EUV) source built for surface processing of polymers is presented. The source is based on a double-stream gas puff target created in a vacuum chamber synchronously with the pumping laser pulse. The target is formed by pulsed injection of Kr, Xe or a KrXe gas mixture into a hollow stream of helium. The EUV radiation is focused using a grazing incidence gold-plated ellipsoidal collector. Spectrum of the reflected radiation consists of a narrow feature with intensity maximum at 10-11 nm wavelength and a long-wavelength spectral tail up to 70 nm. The exact spectral distribution depends on a gas applied for plasma creation. To avoid strong absorption of the EUV radiation in a residual gas present in the chamber during the source operation a two step differential pumping system was employed. The system allows for polymer processing under relatively high vacuum conditions (10 -5 mbar) or in a reactive gas atmosphere. Polymer samples can be irradiated in a focal plane of the EUV collector or at some distance downstream the focal plane. This way fluence of the EUV beam at the polymer surface can be regulated.

  12. Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes

    CERN Document Server

    Dolgov, A; Abrikosov, A; Snegirev, E; Krivtsun, V M; Lee, C J; Bijkerk, F

    2014-01-01

    An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.

  13. Metrology tools for EUV-source characterization and optimization

    Science.gov (United States)

    Missalla, Thomas; Schuermann, Max C.; Lebert, Rainer; Wies, Christian; Juschkin, Larissa; Klein, Roman M.; Scholze, Frank; Ulm, Gerhard; Egbert, Andre; Tkachenko, Boris; Chichkov, Boris N.

    2004-05-01

    The development of suitable radiation sources for extreme ultraviolet lithography (EUVL) is a major challenge. For the optimization of these sources and for the determination of the parameters needed for the system design and the system integration these sources have to be characterized in terms of the absolute in-band power, the spectral distribution in the EUV spectral region and the out-of-band spectral regions, the spatial distribution of the emitting volume and the angular distribution of the emission. For improving the lifetime of such sources, generally accepted as one key risk with EUVL, another task, the debris emitted from sources under development has to be investigated. Therefore, JENOPTIK Mikrotechnik GmbH is co-operating with the Laser Laboratorium Goettingen, the Physikalisch-Technische Bundesanstalt (PTB) and the AIXUV GmbH in developing ready-for-use metrology tools for EUVL source characterization and optimization. The set of the tools employed for EUV-source characterization is presented in detail as well as concepts for calibration and measurement procedures.

  14. Debris and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance.

    Energy Technology Data Exchange (ETDEWEB)

    Allain, J. P.; Nieto, M.; Hendricks, M.; Harilal, S. S.; Hassanein, A.; Mathematics and Computer Science

    2007-01-01

    Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources to debris (fast ions, neutrals, off-band radiation, droplets) remains one of the highest critical issues of source component lifetime and commercial feasibility of nanolithography at 13.5-nm. Typical radiators used at 13.5-nm include Xe and Sn. Fast particles emerging from the pinch region of the lamp are known to induce serious damage to nearby collector mirrors. Candidate collector configurations include either multi-layer mirrors (MLM) or single-layer mirrors (SLM) used at grazing incidence. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance at 13.5-nm under fast Sn or Xe exposure. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity (15-degree incidence and 13.5-nm) variation during fast particle exposure. Intense EUV light and off-band radiation is also known to contribute to mirror damage. For example offband radiation can couple to the mirror and induce heating affecting the mirror's surface properties. In addition, intense EUV light can partially photo-ionize background gas (e.g., Ar or He) used for mitigation in the source device. This can lead to local weakly ionized plasma creating a sheath and accelerating charged gas particles to the mirror surface and inducing sputtering. In this paper we study several aspects of debris and radiation-induced damage to candidate EUVL source collector optics materials. The first study concerns the use of IMD simulations to study the effect of surface roughness on EUV reflectivity. The second studies the effect of fast particles on MLM reflectivity at 13.5-nm. And lastly the third studies the effect of multiple energetic sources with thermal Sn on 13.5-nm reflectivity. These studies focus on conditions that simulate the EUVL source environment in a controlled way.

  15. Debris- and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance

    Science.gov (United States)

    Allain, J. P.; Nieto, M.; Hendricks, M.; Harilal, S. S.; Hassanein, A.

    2007-05-01

    Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources to debris (fast ions, neutrals, off-band radiation, droplets) remains one of the highest critical issues of source component lifetime and commercial feasibility of nanolithography at 13.5-nm. Typical radiators used at 13.5-nm include Xe and Sn. Fast particles emerging from the pinch region of the lamp are known to induce serious damage to nearby collector mirrors. Candidate collector configurations include either multi-layer mirrors (MLM) or single-layer mirrors (SLM) used at grazing incidence. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance at 13.5-nm under fast Sn or Xe exposure. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity (15-degree incidence and 13.5-nm) variation during fast particle exposure. Intense EUV light and off-band radiation is also known to contribute to mirror damage. For example offband radiation can couple to the mirror and induce heating affecting the mirror's surface properties. In addition, intense EUV light can partially photo-ionize background gas (e.g., Ar or He) used for mitigation in the source device. This can lead to local weakly ionized plasma creating a sheath and accelerating charged gas particles to the mirror surface and inducing sputtering. In this paper we study several aspects of debris and radiation-induced damage to candidate EUVL source collector optics materials. The first study concerns the use of IMD simulations to study the effect of surface roughness on EUV reflectivity. The second studies the effect of fast particles on MLM reflectivity at 13.5-nm. And lastly the third studies the effect of multiple energetic sources with thermal Sn on 13.5-nm reflectivity. These studies focus on conditions that simulate the EUVL source environment in a controlled way.

  16. Deposition and sputtering yields on EUV collector mirror from Laser Plasma Extreme Ultraviolet Sources

    Energy Technology Data Exchange (ETDEWEB)

    Wu Tao [Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China); Rao Zhiming [Depart of Computer Science, Jiangxi University of Traditional Chinese Medicine, Nanchang 330004, Jiangxi (China); Wang Shifang, E-mail: flatime@163.com [School of Physics and Electric Information, Hubei University of Education 1 Nanhuan Road, Wuhan East High-Tech. Zone, Wuhan 430205, Hubei (China)

    2011-02-01

    Based on the self-similar solution of gas dynamic equations, spherical expansion of the highly ionized plasma with limited mass into a vacuum is investigated for the droplet target laser-produced plasma extreme ultraviolet (LPP-EUV) sources. Using partially numerical and partially analytical technology, the velocity, the temperature and the density profiles in the plume versus ionization degree, adiabatic index and initial conditions are presented. Furthermore, the spatial thickness variations of the deposited substrate witness and ion sputtering yields for Ru, Mo, and Si under Sn ion bombardment are theoretically calculated, which can be useful to enable LPP-EUV sources suppliers to estimate collector lifetime and improve debris mitigation systems.

  17. Overcoming etch challenges related to EUV based patterning (Conference Presentation)

    Science.gov (United States)

    Metz, Andrew W.; Cottle, Hongyun; Honda, Masanobu; Morikita, Shinya; Kumar, Kaushik A.; Biolsi, Peter

    2017-04-01

    Research and development activities related to Extreme Ultra Violet [EUV] defined patterning continue to grow for plasma etch trade-offs related to traditional approaches of PR smoothing, descum implementation and maintaining 2D aspect ratios of short lines or elliptical contacts concurrent with ultra-high photo resist [PR] selectivity. In this paper we will discuss sources of LER/LWR, impact of material choice, integration, and innovative plasma process techniques and describe how TELTM VigusTM CCP Etchers can enhance PR selectivity, reduce LER/LWR, and maintain 2D aspect ratio of incoming patterns. Beyond traditional process approaches this paper will show the utility of: [1] DC Superposition in enhancing EUV resist hardening and selectivity, increasing resistance to stress induced PR line wiggle caused by CFx passivation, and mitigating organic planarizer wiggle; [2] Quasi Atomic Layer Etch [Q-ALE] for ARC open eliminating the tradeoffs between selectivity, CD, and shrink ratio control; and [3] ALD+Etch FUSION technology for feature independent CD shrink and LER reduction. Applicability of these concepts back transferred to 193i based lithography is also confirmed.

  18. Laser-plasma SXR/EUV sources: adjustment of radiation parameters for specific applications

    Science.gov (United States)

    Bartnik, A.; Fiedorowicz, H.; Fok, T.; Jarocki, R.; Kostecki, J.; Szczurek, A.; Szczurek, M.; Wachulak, P.; Wegrzyński, Ł.

    2014-12-01

    In this work soft X-ray (SXR) and extreme ultraviolet (EUV) laser-produced plasma (LPP) sources employing Nd:YAG laser systems of different parameters are presented. First of them is a 10-Hz EUV source, based on a double-stream gaspuff target, irradiated with the 3-ns/0.8J laser pulse. In the second one a 10 ns/10 J/10 Hz laser system is employed and the third one utilizes the laser system with the pulse shorten to approximately 1 ns. Using various gases in the gas puff targets it is possible to obtain intense radiation in different wavelength ranges. This way intense continuous radiation in a wide spectral range as well as quasi-monochromatic radiation was produced. To obtain high EUV or SXR fluence the radiation was focused using three types of grazing incidence collectors and a multilayer Mo/Si collector. First of them is a multfoil gold plated collector consisted of two orthogonal stacks of ellipsoidal mirrors forming a double-focusing device. The second one is the ellipsoidal collector being part of the axisymmetrical ellipsoidal surface. Third of the collectors is composed of two aligned axisymmetrical paraboloidal mirrors optimized for focusing of SXR radiation. The last collector is an off-axis ellipsoidal multilayer Mo/Si mirror allowing for efficient focusing of the radiation in the spectral region centered at λ = 13.5 ± 0.5 nm. In this paper spectra of unaltered EUV or SXR radiation produced in different LPP source configurations together with spectra and fluence values of focused radiation are presented. Specific configurations of the sources were assigned to various applications.

  19. SCRIC: a code dedicated to the detailed emission and absorption of heterogeneous NLTE plasmas; application to xenon EUV sources; SCRIC: un code pour calculer l'absorption et l'emission detaillees de plasmas hors equilibre, inhomogenes et etendus; application aux sources EUV a base de xenon

    Energy Technology Data Exchange (ETDEWEB)

    Gaufridy de Dortan, F. de

    2006-07-01

    Nearly all spectral opacity codes for LTE and NLTE plasmas rely on configurations approximate modelling or even supra-configurations modelling for mid Z plasmas. But in some cases, configurations interaction (either relativistic and non relativistic) induces dramatic changes in spectral shapes. We propose here a new detailed emissivity code with configuration mixing to allow for a realistic description of complex mid Z plasmas. A collisional radiative calculation. based on HULLAC precise energies and cross sections. determines the populations. Detailed emissivities and opacities are then calculated and radiative transfer equation is resolved for wide inhomogeneous plasmas. This code is able to cope rapidly with very large amount of atomic data. It is therefore possible to use complex hydrodynamic files even on personal computers in a very limited time. We used this code for comparison with Xenon EUV sources within the framework of nano-lithography developments. It appears that configurations mixing strongly shifts satellite lines and must be included in the description of these sources to enhance their efficiency. (author)

  20. Applications of compact laser-driven EUV/XUV plasma sources

    Science.gov (United States)

    Barkusky, Frank; Bayer, Armin; Döring, Stefan; Flöter, Bernhard; Großmann, Peter; Peth, Christian; Reese, Michael; Mann, Klaus

    2009-05-01

    In recent years, technological developments in the area of extreme ultraviolet lithography (EUVL) have experienced great improvements. So far, intense light sources based on discharge or laser plasmas, beam steering and imaging optics as well as sensitive detectors are available. Currently, applications of EUV radiation apart from microlithography, such as metrology, high-resolution microscopy, or surface analysis come more and more into focus. In this contribution we present an overview on the EUV/XUV activities of the Laser-Laboratorium Göttingen based on table-top laser-produced plasma (LPP) sources. As target materials gaseous or liquid jets of noble gases or solid Gold are employed. Depending on the applications, the very clean but low intense gaseous targets are mainly used for metrology, whereas the targets for high brilliances (liquid, solid) are used for microscopy and direct structuring. For the determination of interaction mechanisms between EUV radiation and matter, currently the solid Gold target is used. In order to obtain a small focal spot resulting in high EUV fluence, a modified Schwarzschild objective consisting of two spherical mirrors with Mo/Si multilayer coatings is adapted to this source. By demagnified (10x) imaging of the Au plasma an EUV spot of 3 μm diameter with a maximum energy density of ~1.3 J/cm2 is generated (pulse duration 8.8 ns). First applications of this integrated source and optics system reveal its potential for high-resolution modification and direct structuring of solid surfaces. For chemical analysis of various samples a NEXAFS setup was developed. It consists of a LPP, using gaseous Krypton as a broadband emitter in the water-window range, as well as a flat field spectrograph. The laboratory system is set to the XUV spectral range around the carbon K-edge (4.4 nm). The table-top setup allows measurements with spectral accuracy comparable to synchrotron experiments. NEXAFS-experiments in transmission and reflection are

  1. Effects of plasma spatial profile on conversion efficiency of laser produced plasma sources for EUV lithography

    Science.gov (United States)

    Hassanein, A.; Sizyuk, V.; Sizyuk, T.; Harilal, S.

    2009-03-01

    Extreme ultraviolet (EUV) lithography devices that use laser produced plasma (LPP), discharge produced plasma (DPP), and hybrid devices need to be optimized to achieve sufficient brightness with minimum debris generation to support the throughput requirements of High-Volume Manufacturing (HVM) lithography exposure tools with long lifetime. Source performance, debris mitigation, and reflector system are all critical to efficient EUV collection and component lifetime. Enhanced integrated models are continued to be developed using HEIGHTS computer package to simulate EUV emission at high power and debris generation and transport in multiple and colliding LPP. A new center for materials under extreme environments (CMUXE) is established to benchmark HEIGHTS models for various EUV related issues. The models being developed and enhanced include, for example, new ideas and parameters of multiple laser beams in different geometrical configurations and with different pre-pulses to maximize EUV production. Recent experimental and theoretical work show large influence of the hydrodynamic processes on EUV generation. The effect of plasma hydrodynamics evolution on the EUV radiation generation was analyzed for planar and spherical geometry of a tin target in LPP devices. The higher efficiency of planar target in comparison to the spherical geometry was explained with better hydrodynamic containment of the heated plasma. This is not the case if the plasma is slightly overheated. Recent experimental results of the conversion efficiency (CE) of LPP are in good agreement with HEIGHTS simulation.

  2. Synergistic effect of EUV from the laser-sustained detonation plasma in a ground-based atomic oxygen simulation on fluorinated polymers

    Science.gov (United States)

    Tagawa, Masahito; Abe, Shingo; Kishida, Kazuhiro; Yokota, Kumiko; Okamoto, Akio

    2009-01-01

    The contribution of extreme ultraviolet (EUV) from a laser-sustained plasma on the mass loss phenomenon of fluorinated polymer in a ground-based laser-detonation atomic oxygen beam source was evaluated. The atomic oxygen beam and EUV from the oxygen plasma were separated by the high-speed chopper wheel installed in the beam source. The mass changes of the fluorinated polymer and polyimide were measured from the frequency shift of the quartz crystal microbalance during the beam exposures. It has been made clear that the fluorinated polymer erodes by EUV exposure alone. In contrast, no erosion was detected for polyimide by EUV alone. The atomic oxygen-induced erosion was measured for both materials even without EUV exposure. However, no strong synergistic effect was observed for a fluorinated polymer even under the simultaneous exposure condition of atomic oxygen and EUV. Similar results were observed even in simultaneous exposure of atomic oxygen (without EUV) and 172 nm vacuum ultraviolet (VUV) from an excimer lamp. These experiments suggest that the primary origin of the accelerated erosion of fluorinated polymer observed in a laser detonation atomic oxygen source is not the EUV from the laser-sustained plasma.

  3. Surface modification by EUV laser beam based on capillary discharge

    Czech Academy of Sciences Publication Activity Database

    Frolov, Oleksandr; Koláček, Karel; Schmidt, Jiří; Štraus, Jaroslav; Prukner, Václav; Shukurov, A.

    -, č. 58 (2011), s. 484-487 ISSN 2010-376X. [International Conference on Fusion and Plasma Physics. Bali, Indonésie, 26.10.2011-28.10.2011] R&D Projects: GA AV ČR KAN300100702; GA MŠk LA08024; GA MŠk(CZ) LC528 Institutional research plan: CEZ:AV0Z20430508 Keywords : soft x-ray * EUV * laser * radiation * source * capillary * discharge * plasma * ablation * surface modification Subject RIV: BL - Plasma and Gas Discharge Physics http://www.waset.org/journals/waset/v58/v58-99.pdf

  4. Sub-hundred Watt operation demonstration of HVM LPP-EUV source

    Science.gov (United States)

    Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu; Ohta, Takeshi; Nowak, Krzysztof M.; Kawasuji, Yasufumi; Tanaka, Hiroshi; Watanabe, Yukio; Hori, Tsukasa; Kodama, Takeshi; Shiraishi, Yutaka; Yanagida, Tatsuya; Yamada, Tsuyoshi; Yamazaki, Taku; Okazaki, Shinji; Saitou, Takashi

    2014-04-01

    Since 2002, we have been developing a CO2-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO2 laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO2 laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO2 amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO2 laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy 1). In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO2 laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO2 laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP

  5. Background pressure effects on EUV source efficiency and produced debris characteristics

    Science.gov (United States)

    Sizyuk, Tatyana

    2017-03-01

    The cost of future computer chips, among other things, will depend on the performance of EUV sources and on the duration of the efficient operation and lifetime of nanolithography devices. While the efficiency of the sources is continuously being improved, their operational cycle is still highly restricted due to optical mirrors degradation as well as necessity of cleaning chamber environment and components. One of the potential problems of EUV sources for high volume manufacture (HVM) regimes can be related to the contamination of chamber environment by products of preceding laser pulse/droplet interactions. Implementation of high, 100 kHz and higher, repetition rate of devices for Sn droplets and laser pulses generation can cause high accumulation of tin in the chamber in the form of vapor/clusters. Possible tin accumulation in the chamber in dependence on laser parameters and mitigation system efficiency was evaluated. Then, the effects of various pressures of tin vapor on the CO2 and Nd:YAG laser beams propagation and on the size, the intensity, and the efficiency of EUV sources produced were studied.

  6. AlN Based Extreme Ultraviolet (EUV) Detectors Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This Phase I project is to investigate the feasibility for achieving EUV detectors for space applications by exploiting the ultrahigh bandgap semiconductor - AlN. We...

  7. Ultrafast Magnetism Dynamics Measure Using Tabletop Ultrafast EUV Sources

    Energy Technology Data Exchange (ETDEWEB)

    Silva, Thomas J. [NIST; Murnane, Margaret [University of Colorado

    2013-08-21

    In our work to date, we made two significant advances. First we demonstrated element-selective demagnetization dynamics for the first time, with a record time resolution for x-ray probing of 55 fs. Second, in new work, we were able to probe the timescale of the exchange interaction in magnetic materials, also for the first time. Our measurements were made using the transverse magneto-optic Kerr effect (T-MOKE) geometry, since the reflectivity of a magnetic material changes with the direction of the magnetization vector of a surface. In our experiment, we periodically reversed the magnetization direction of a grating structure made of Permalloy (Ni80Fe20) using an external magnetic field. To achieve maximum contrast, we used HHG light spanning the M-shell (3p) absorption edges of Fe and Ni. Our characterization of the static magnetization of a Permalloy sample shows high magnetic asymmetry at photon energies just above and below the absorption edges at 55 eV and 65 eV, respectively. This result is in excellent agreement with measurements done on the same using a synchrotron source.

  8. Numerical simulations based on probe measurements in EUV-induced hydrogen plasma

    Science.gov (United States)

    Abrikosov, Alex; Reshetnyak, Viktor; Astakhov, Dmitry; Dolgov, Alexandr; Yakushev, Oleg; Lopaev, Dmitry; Krivtsun, Vladimir

    2017-04-01

    We use the two-dimensional particle-in-cell model with Monte Carlo collisions to study the plasma induced in hydrogen by short pulses of extreme ultraviolet (EUV) radiation at wavelengths in the range 10-20 nm with a pulse duration of about 40 ns (FWHM). This plasma is formed via both photoionization by the high-energy EUV photons and by the secondary photoelectrons emitted from the hydrogen molecules and the irradiated surface. The latter process can be enhanced by the external electric field that accelerates the electrons. In order to establish a base for our model so as to obtain accurate results, we record a temporally-resolved series of current-voltage characteristics for a small probing electrode inserted into EUV-induced hydrogen plasma. We then resort to simulating this plasma in the same geometry with the probe in our model which we validate by matching its results to the experimentally measured dynamics of the probe current-voltage curves. Having validated the model this way, we use this model as an independent instrument capable of obtaining the spatiotemporal picture of EUV-induced plasma evolution. We use this instrument to study the plasma formation during the EUV pulse and point out the processes that take part in forming this plasma, such as impact ionization and direct ionization by EUV photons.

  9. Reconstruction of the solar EUV irradiance from 1996 to 2010 based on SOHO/EIT images

    Directory of Open Access Journals (Sweden)

    Haberreiter Margit

    2014-01-01

    Full Text Available The solar Extreme UltraViolet (EUV spectrum has important effects on the Earth’s upper atmosphere. For a detailed investigation of these effects it is important to have a consistent data series of the EUV spectral irradiance available. We present a reconstruction of the solar EUV irradiance based on SOHO/EIT images, along with synthetic spectra calculated using different coronal features which represent the brightness variation of the solar atmosphere. The EIT images are segmented with the SPoCA2 tool which separates the features based on a fixed brightness classification scheme. With the SOLMOD code we then calculate intensity spectra for the 10–100 nm wavelength range and each of the coronal features. Weighting the intensity spectra with the area covered by each of the features yields the temporal variation of the EUV spectrum. The reconstructed spectrum is then validated against the spectral irradiance as observed with SOHO/SEM. Our approach leads to good agreement between the reconstructed and the observed spectral irradiance. This study is an important step toward understanding variations in the solar EUV spectrum and ultimately its effect on the Earth’s upper atmosphere.

  10. Analysis, simulation, and experimental studies of YAG and CO2 laser-produced plasma for EUV lithography sources

    Science.gov (United States)

    Hassanein, A.; Sizyuk, V.; Harilal, S. S.; Sizyuk, T.

    2010-04-01

    Efficient laser systems are essential for the realization of high volume manufacturing in extreme ultraviolet lithography (EUVL). Solid-state Nd:YAG lasers usually have lower efficiency and source suppliers are alternatively investigating the use of high power CO2 laser systems. However, CO2 laser-produced plasmas (LPP) have specific characteristics and features that should be taken into account when considering them as the light source for EUVL. The analysis of recent experimental and theoretical work showed significant differences in the properties of plasma plumes produced by CO2 and the Nd:YAG lasers including EUV radiation emission, source formation, debris generation, and conversion efficiency. The much higher reflectivity of CO2 laser from liquid, vapor, and plasma of a tin target results in the production of optically thinner plumes with higher velocity and in a better formation of plasma properties (temperature and density values) towards more efficient EUV source. However, the spikes in the temporal profiles of current CO2 laser will additionally affect the properties of the produced plasma. We have developed unique combination of state-of-the-art experimental facilities (CMUXE Laboratory) and advanced computer simulation (HEIGHTS) package for studying and optimizing various lasers, discharge produced plasmas (DPP), and target parameters as well as the optical collection system regarding EUV lithography. In this work, detailed characteristics of plasmas produced by CO2 and Nd:YAG lasers were analyzed and compared both experimentally and theoretically for optimizing EUV from LPP sources. The details of lower overheating of plasma produced by CO2 laser are given with time and explain how to utilize the high reflectivity of such lasers in plasmas produced in different target geometries to significantly enhance the conversion efficiency of EUV radiation.

  11. Evolution analysis of EUV radiation from laser-produced tin plasmas based on a radiation hydrodynamics model.

    Science.gov (United States)

    Su, M G; Min, Q; Cao, S Q; Sun, D X; Hayden, P; O'Sullivan, G; Dong, C Z

    2017-03-23

    One of fundamental aims of extreme ultraviolet (EUV) lithography is to maximize brightness or conversion efficiency of laser energy to radiation at specific wavelengths from laser produced plasmas (LPPs) of specific elements for matching to available multilayer optical systems. Tin LPPs have been chosen for operation at a wavelength of 13.5 nm. For an investigation of EUV radiation of laser-produced tin plasmas, it is crucial to study the related atomic processes and their evolution so as to reliably predict the optimum plasma and experimental conditions. Here, we present a simplified radiation hydrodynamic model based on the fluid dynamic equations and the radiative transfer equation to rapidly investigate the evolution of radiation properties and dynamics in laser-produced tin plasmas. The self-absorption features of EUV spectra measured at an angle of 45° to the direction of plasma expansion have been successfully simulated and explained, and the evolution of some parameters, such as the plasma temperature, ion distribution and density, expansion size and velocity, have also been evaluated. Our results should be useful for further understanding of current research on extreme ultraviolet and soft X-ray source development for applications such as lithography, metrology and biological imaging.

  12. Analytical techniques for mechanistic characterization of EUV photoresists

    Science.gov (United States)

    Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

    2017-03-01

    Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

  13. EUV optics in photoionization experiments

    Science.gov (United States)

    Bartnik, Andrzej; Wachulak, Przemysław; Fiedorowicz, Henryk; Fok, Tomasz; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Anna; Szczurek, Mirosław; Pina, Ladislav; Sveda, Libor

    2013-05-01

    In this work photoionized plasmas were created by irradiation of He, Ne and Ar gases with a focused EUV beam from one of two laser-plasma sources employing Nd:YAG laser systems of different parameters. First of them was a 10-Hz laser-plasma EUV source, based on a double-stream gas-puff target, irradiated with the 3-ns/0.8J laser pulse. EUV radiation in this case was focused using a gold-plated grazing incidence ellipsoidal collector in the wavelength range λ = 9÷70 nm. The most intense emission was in the relatively narrow spectral region centred at λ = 11 +/- 1 nm. The second source was based on a 10 ns/10 J/10 Hz laser system. In this case EUV radiation was focused using a gold-plated grazing incidence multifoil collector or a Mo-coated ellipsoidal collector. The most intense emission in this case was in the 5 ÷ 15 nm spectral region. Radiation fluence ranged from 60 mJ/cm2 to 400 mJ/cm2. Different gases were injected into the interaction region, perpendicularly to an optical axis of the irradiation system, using an auxiliary gas puff valve. Irradiation of the gases resulted in ionization and excitation of atoms and ions. Spectra in EUV range were measured using a grazing incidence, flat-field spectrometer (McPherson Model 251), equipped with a 450 lines/mm toroidal grating. In all cases the most intense emission lines were assigned to singly charged ions. The other emission lines belong to atoms or doubly charged ions. The spectra were excited in low density gases of the order of 1 ÷ 10% atmospheric density.

  14. Free-electron laser emission architecture impact on EUV lithography

    Science.gov (United States)

    Hosler, Erik R.; Wood, Obert R.; Barletta, William A.

    2017-03-01

    Laser-produced plasma (LPP) EUV sources have demonstrated approximately 125 W at customer sites, establishing confidence in EUV lithography as a viable manufacturing technology. However, beyond the 7 nm technology node existing scanner/source technology must enable higher-NA imaging systems (requiring increased resist dose and providing half-field exposures) and/or EUV multi-patterning (requiring increased wafer throughput proportional to the number of exposure passes. Both development paths will require a substantial increase in EUV source power to maintain the economic viability of the technology, creating an opportunity for free-electron laser (FEL) EUV sources. FEL-based EUV sources offer an economic, high-power/single-source alternative to LPP EUV sources. Should free-electron lasers become the preferred next generation EUV source, the choice of FEL emission architecture will greatly affect its operational stability and overall capability. A near-term industrialized FEL is expected to utilize one of the following three existing emission architectures: (1) selfamplified spontaneous emission (SASE), (2) regenerative amplification (RAFEL), or (3) self-seeding (SS-FEL). Model accelerator parameters are put forward to evaluate the impact of emission architecture on FEL output. Then, variations in the parameter space are applied to assess the potential impact to lithography operations, thereby establishing component sensitivity. The operating range of various accelerator components is discussed based on current accelerator performance demonstrated at various scientific user facilities. Finally, comparison of the performance between the model accelerator parameters and the variation in parameter space provides a means to evaluate the potential emission architectures. A scorecard is presented to facilitate this evaluation and provide a framework for future FEL design and enablement for EUV lithography applications.

  15. High-Resolution, Quantitative, and Three-Dimensional Coherent Diffractive Imaging with a Tabletop EUV Source

    Science.gov (United States)

    Shanblatt, Elisabeth Rose

    Imaging is a critical tool used across a broad range of applications in science, technology, medicine, and manufacturing. Microscopy, the type of imaging which allows us to access the elusive yet rich world of what is smaller than we can naturally see--makes it possible to observe and design the nano-world of biological, material, and nanofabricated systems. In this thesis, I describe the development of a new type of microscopy that combines two powerful tools: coherent extreme ultraviolet (EUV) light sources produced by high harmonic generation, and ptychographic coherent diffractive imaging. This microscope produces high-resolution, chemically-specific, phase- and amplitude-contrast images with large fields of view on the order of hundreds of microns, while preserving a high spatial resolution on the scale of tens of nanometers. Recently, we extended this new tabletop microscopy technique to image reflective samples, periodic samples, and to image dynamic nano-scale elastic and thermal processes. I will discuss these advances and in particular demonstrate two new capabilities: first, a new imaging technique with high compositionally- and morphologically-sensitive quantitative information, capable of imaging reactions and diffusion at a buried interface. This capability will open up a new, exquisitely sensitive layer-by-layer imaging that has many applications in nanoscience and nanotechnology, including surface and materials science and metrology. Secondly, I will demonstrate imaging of a thick sample in three dimensions. By accounting for diffraction within a thick sample, it is possible to obtain high-resolution three-dimensional images of biological and meta-material samples non-invasively, and without the use of staining or labeling.

  16. Phosphorus-based compounds for EUV multilayer optics materials

    NARCIS (Netherlands)

    Medvedev, Viacheslav; Yakshin, Andrey; van de Kruijs, Robbert Wilhelmus Elisabeth; Bijkerk, Frederik

    2015-01-01

    We have evaluated the prospects of phosphorus-based compounds in extreme ultraviolet multilayer optics. Boron phosphide (BP) is suggested to be used as a spacer material in reflective multilayer optics operating just above the L-photoabsorption edge of P (λ ≈9.2 nm). Mo, Ag, Ru, Rh, and Pd were

  17. Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) for control of biocompatibility

    Energy Technology Data Exchange (ETDEWEB)

    Ahad, Inam Ul, E-mail: inam-ul.ahad@wat.edu.pl [Institute of Optoelectronics, Military University of Technology, 00-908 Warsaw (Poland); Advanced Processing Technology Research Centre, School of Mechanical and Manufacturing Engineering, Faculty of Engineering & Computing, Dublin City University, Dublin 9 (Ireland); Butruk, Beata [Department of Biotechnology and Bioprocess Engineering, Warsaw University of Technology, Ul. Waryńskiego 1, 00-645 Warsaw (Poland); Ayele, Mesfin; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk [Institute of Optoelectronics, Military University of Technology, 00-908 Warsaw (Poland); Ciach, Tomasz [Department of Biotechnology and Bioprocess Engineering, Warsaw University of Technology, Ul. Waryńskiego 1, 00-645 Warsaw (Poland); Brabazon, Dermot [Advanced Processing Technology Research Centre, School of Mechanical and Manufacturing Engineering, Faculty of Engineering & Computing, Dublin City University, Dublin 9 (Ireland)

    2015-12-01

    Extreme ultraviolet (EUV) surface modification of polytetrafluoroethylene (PTFE) was performed in order to enhance the degree of biocompatibility. Polymer samples were irradiated by different number of EUV shots using a laser–plasma based EUV source in the presence of nitrogen gas. The physical and chemical properties of EUV modified PTFE samples were studied using Atomic Force Microscopy, X-ray photoelectron spectroscopy and water contact angle (WCA) methods. Pronounced wall type micro and nano-structures appeared on the EUV treated polymer surfaces resulting in increased surface roughness and hydrophobicity. Stronger cell adhesion and good cell morphology were observed on EUV modified surfaces by in-vitro cell culture studies performed using L929 fibroblasts.

  18. High-power extreme ultraviolet source based on gas jets

    Energy Technology Data Exchange (ETDEWEB)

    Kubiak, G.D.; Bernardez, L.J.; Krenz, K.

    1998-03-01

    The authors report on the development of a high power laser plasma Extreme Ultraviolet (EUV) source for Extreme Ultraviolet Lithography. The source is based on the plasma emission of a recycled jet beam of large Xe clusters and produces no particulate debris. The source will be driven by a pulsed laser delivering 1,500 W of focused average power to the cluster jet target. To develop condensers and to optimize source performance, a low power laboratory cluster jet prototype has been used to study the spectroscopy, angular distributions, and EUV source images of the cluster jet plasma emission. In addition, methods to improve the reflectance lifetimes of nearby plasma facing condenser mirrors have been developed. The resulting source yields EUV conversion efficiencies up to 3.8% and mirror lifetimes of 10{sup 9} plasma pulses.

  19. Estimation of temporal evolution of the helium plasmasphere based on a sequence of IMAGE/EUV images

    Science.gov (United States)

    Nakano, S.; Fok, M.-C.; Brandt, P. C.; Higuchi, T.

    2014-05-01

    We have developed a technique for estimating the temporal evolution of the plasmaspheric helium ion density based on a sequence of extreme ultraviolet (EUV) data obtained from the IMAGE satellite. In the proposed technique, the estimation is obtained by incorporating EUV images from IMAGE into a two-dimensional fluid model of the plasmasphere using a data assimilation approach based on the ensemble transform Kalman filter. Since the motion and the spatial structure of the helium plasmasphere is strongly controlled by the electric field in the inner magnetosphere, the electric field around the plasmapause can also be estimated using the ensemble transform Kalman filter. We performed an experiment using synthetic images that were generated from the same numerical model under a certain condition. It was confirmed that the condition that generated the synthetic images was successfully reproduced. We also present some results obtained using real EUV imaging data. Finally, we discuss the possibility of estimating the density profile along a magnetic field line. Since each EUV image was taken from a different direction due to the motion of the IMAGE satellite, we could obtain the information on the density profile along a field line by combining multiple images.

  20. EUV micropatterning for biocompatibility control of PET

    Science.gov (United States)

    Reisinger, B.; Fahrner, M.; Frischauf, I.; Yakunin, S.; Svorcik, V.; Fiedorowicz, H.; Bartnik, A.; Romanin, C.; Heitz, J.

    2010-08-01

    We have investigated the influence of oriented microstructures at modified polyethylene terephthalate (PET) on the adhesion and alignment of Chinese hamster ovary (CHO) cells. For surface modification, the PET foils were exposed to the radiation of a laser-plasma extreme ultraviolet (EUV) source based on a double-stream gas-puff target. The emission of the plasma was focused onto the samples by means of a gold-plated ellipsoidal collector. The spectrum of the focused radiation covered the wavelength range from 9 to 70 nm. The PET samples were irradiated with the EUV pulses at a repetition rate of 10 Hz in a high vacuum. For control experiments, PET samples were also irradiated in air with the light of a 193 nm ArF-excimer laser. Different kinds of surface microstructures were obtained depending on the EUV or laser fluence and pulse number, including oriented wall- and ripple-type structures with lateral structure periods of a few µm. The surface morphology of polymer samples after the irradiation was investigated using a scanning electron microscope (SEM). Changes in chemical surface structure of the irradiated samples were investigated using X-ray photoelectron spectroscopy (XPS). We demonstrated that the cells show good adhesion and align along oriented wall- and ripple-type microstructures on PET surfaces produced by the EUV irradiation.

  1. Rising from the Dead: the Revival of the EUVE E/PO

    Science.gov (United States)

    Cullison, J. L.; Craig, N.; Stroozas, B. A.; Malina, R. F.

    2000-05-01

    NASA's Extreme Ultraviolet Explorer (EUVE) is dedicated to gathering data on our sky via instrumentation sensitive to the region of light between 76 and 760 angstroms. Since the all-sky survey was completed in 1993, astronomers have made studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they have learned about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation. In its pre-launch and early prime mission, EUVE had a thriving education and public outreach (E/PO) program formed expressly to spread the word on recent EUVE findings, but due to budgetary restraints in its extended mission, the project has been unable in recent years to support extensive E/PO efforts. Now in it's eighth year of operation, the EUVE Project has revived its E/PO efforts without significantly impacting its shoe-string budget. Web sites are being reconstructed, including sophisticated interactive learning environments where elementary through college level students, teachers, and the general public can select from lesson plans including, for example, an introductory astronomical module on the relationship between spectra and object classification, download three-dimensional cutouts of the EUVE skymap, view a slide show on the history and instrumentation of the satellite, take a virtual tour of the EUVE observatory, find where EUVE is in its orbit, and catch up on EUVE's most recent news and events. EUVE's revived internet E/PO presence is supplemented with staff and technical support (up to 10% of each staff person's time) of hands-on elementary and community projects coordinated by the UC Berkeley Center for Science Education (the now independent offshoot of the original EUVE E/PO). All elements of the EUVE E/PO are supported without impacting the efficient and highly productive science goals of the small-staffed mission. Additional EUVE E/PO efforts in the works include

  2. Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN

    Science.gov (United States)

    Rajendran, Rajeev; Mochi, Iacopo; Helfenstein, Patrick; Mohacsi, Istvan; Redford, Sophie; Mozzanica, Aldo; Schmitt, Bernd; Yoshitake, Shushuke; Ekinci, Yasin

    2017-03-01

    With extreme ultraviolet (EUV) lithography getting ready to enter high volume manufacturing, there is an imminent need to address EUV mask metrology infrastructure. Actinic defect inspection of patterned EUV photomasks has been identified as an essential step for mask qualification, but there is no commercial tool available right now. We address this gap with the RESCAN tool, a defect inspection platform being built at Paul Scherrer Institut (PSI), co-developed in collaboration with Nuflare Inc, Japan. RESCAN uses Scanning Scattering Contrast Microscopy (SSCM) and Scanning Coherent Diffraction Imaging (SCDI) for fast defect detection and fine defect localization. The development of a stand-alone tool based on these techniques relies on the availability of (1) a bright coherent EUV source with a small footprint and (2) a high frame-rate pixel detector with extended dynamic range and high quantum efficiency for EUV. We present two in-house projects at PSI addressing the development of these components: COSAMI and JUNGFRAU. COSAMI (COmpact Source for Actinic Mask Inspection), is a high-brightness EUV source optimized for EUV photons with a relatively small footprint. JUNGFRAU (adJUstiNg Gain detector FoR the Aramis User station) is a silicon-based hybrid pixel detector, developed in house at PSI and prototyped for EUV. With a high frame rate and dynamic range at 13.5 nm, this sensor solution is an ideal candidate for the RESCAN platform. We believe that these ongoing source and sensor programs will pave the way towards a comprehensive solution for actinic patterned mask inspection bridging the gap of actinic defect detection and identification on EUV reticles.

  3. Source par décharge capillaire pour la lithographie EUV

    Science.gov (United States)

    Cachoncinlle, C.; Robert, E.; Sarroukh, O.; Gonthiez, T.; Viladrosa, R.; Fleurier, C.; Pouvesle, J. M.

    2003-06-01

    Dans ce travail, nous présentons les caractéristiques de la lampe à décharge capillaire Capella. Cette source de rayonnement E W peut produire un flux de photon supérieur au Watt (2% BW, 13.5 nm) avec un rendement à la prise de courant de plus de 0.1%. Elle fonctionne soit en mode pulsé à 150 Hz soit en rafale en générant des trains d'impulsion au kilohertz. La stabilité spatiale de la source est meilleure que 50pm et sa stabilité temporelle atteint 0.3%. La longévité de la source est supérieure à 10^7 tirs.

  4. Design and fabrication of advanced EUV diffractive elements

    Energy Technology Data Exchange (ETDEWEB)

    Naulleau, Patrick P.; Liddle, J. Alexander; Salmassi, Farhad; Anderson, Erik H.; Gullikson, Eric M.

    2003-11-16

    As extreme ultraviolet (EUV) lithography approaches commercial reality, the development of EUV-compatible diffractive structures becomes increasingly important. Such devices are relevant to many aspects of EUV technology including interferometry, illumination, and spectral filtering. Moreover, the current scarcity of high power EUV sources makes the optical efficiency of these diffractive structures a paramount concern. This fact has led to a strong interest in phase-enhanced diffractive structures. Here we describe recent advancements made in the fabrication of such devices.

  5. Development of short pulse laser driven micro-hohlraums as a source of EUV radiation

    Science.gov (United States)

    Krushelnick, Karl; Batson, Thomas; McKelvey, Andrew; Raymond, Anthony; Thomas, Alec; Yanovsky, Victor; Nees, John; Maksimchuk, Anatoly

    2015-11-01

    Experiments at large scale laser facilities such as NIF allow the radiativ properties of dens, high-temperature matter to be studied at previously unreachable regime, but are limited by cost and system availability. A scaled system using a short laser pulses and delivering energy to much smaller hohlraum could be capable of reaching comparable energy densities by depositing the energy in a much smaller volume before ablation of the wall material closes the cavit. The laser is tightl focused through the cavity and then expands to illuminate the wall. Experiments were performe using the Hercules Ti:Sapphire laser system at Michiga. Targets include cavities machined in bulk material using low laser power, and then shot in situ with a single full power pulse as well as micron scale pre-fabricate target. Spectral characteristics were measured using a soft X-ray spectromete, K-alpha x-ray imaging system and a filtered photo cathode array. Scalings of the radiation temperature were made for variations in the hohlraum cavit, the pulse duration as well as the focusing conditions. Proof of principle time resolved absorption spectroscopy experiments were also performe. These sources may allow opacity and atomic physics measurements with plasma an radiation temperatures comparable to much larger hohlraums, but with much higher repetition rate and in a university scale laboratory. We acknowledge funding from DTRA grant HDTRA1-11-1-0066.

  6. EUV-multilayers on grating-like topographies

    Energy Technology Data Exchange (ETDEWEB)

    van Boogaard, A. J. R.; Louis, E.; Goldberg, K. A.; Mochi, I.; Bijkerk, F.

    2010-03-12

    In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 {micro}m). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources.

  7. High sensitivity chemically amplified EUV resists through enhanced EUV absorption

    Science.gov (United States)

    Ongayi, Owendi; Christianson, Matthew; Meyer, Matthew; Coley, Suzanne; Valeri, David; Kwok, Amy; Wagner, Mike; Cameron, Jim; Thackeray, Jim

    2012-03-01

    Resolution, line edge roughness, sensitivity and low outgassing are the key focus points for extreme ultraviolet (EUV) resist materials. Sensitivity has become increasingly important so as to address throughput concerns in device manufacturing and compensate for the low power of EUV sources. Recent studies have shown that increasing the polymer linear absorption absorption coefficient in EUV resists translates to higher acid generation efficiency and good pattern formation. In this study, novel high absorbing polymer platforms are evaluated. The contributing effect of the novel absorbing chromophore to the resultant chemically amplified photoresist is evaluated and compared with a standard methacrylate PAG Bound Polymer (PBP) platform. We report that by increasing EUV absorption, we cleanly resolved 17 nm 1:1 line space can be achieved at a sensitivity of 14.5 mJ/cm2, which is consistent with dose requirements dictated by the ITRS roadmap. We also probe the effect of fluorinated small molecule additives on acid yield generation (Dil C) at EUV of a PBP platform.

  8. Robust design of broadband EUV multilayer beam splitters based on particle swarm optimization

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Hui, E-mail: jianghui@sinap.ac.cn [Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Zhangheng Road 239, Pudong District, Shanghai 201204 (China); King' s College London, Department of Physics, Strand, London WC2R 2LS (United Kingdom); Michette, Alan G. [King' s College London, Department of Physics, Strand, London WC2R 2LS (United Kingdom)

    2013-03-01

    A robust design idea for broadband EUV multilayer beam splitters is introduced that achieves the aim of decreasing the influence of layer thickness errors on optical performances. Such beam splitters can be used in interferometry to determine the quality of EUVL masks by comparing with a reference multilayer. In the optimization, particle swarm techniques were used for the first time in such designs. Compared to conventional genetic algorithms, particle swarm optimization has stronger ergodicity, simpler processing and faster convergence.

  9. A solar type II radio burst from CME-coronal ray interaction: simultaneous radio and EUV imaging

    CERN Document Server

    Chen, Yao; Feng, Li; Feng, Shiwei; Kong, Xiangliang; Guo, Fan; Wang, Bing; Li, Gang

    2014-01-01

    Simultaneous radio and extreme ultraviolet (EUV)/white-light imaging data are examined for a solar type II radio burst occurring on 2010 March 18 to deduce its source location. Using a bow-shock model, we reconstruct the 3-dimensional EUV wave front (presumably the type-II emitting shock) based on the imaging data of the two STEREO spacecraft. It is then combined with the Nan\\c{c}ay radio imaging data to infer the 3-dimensional position of the type II source. It is found that the type II source coincides with the interface between the CME EUV wave front and a nearby coronal ray structure, providing evidence that the type II emission is physically related to the CME-ray interaction. This result, consistent with those of previous studies, is based on simultaneous radio and EUV imaging data for the first time.

  10. Secondary Electrons in EUV Lithography

    Energy Technology Data Exchange (ETDEWEB)

    Torok, Justin; Re, Ryan Del; Herbol, Henry; Das, Sanjana; Bocharova, Irina; Paolucci, Angela; Ocola, Leonidas E.; Ventrice Jr., Carl; Lifshin, Eric; Denbeaux, Greg; Brainard, Robert L.

    2013-01-01

    Secondary electrons play critical roles in several imaging technologies, including extreme ultraviolet (EUV) lithography. At longer wavelengths of light (e.g. 193 and 248 nm), the photons are directly involved in the photochemistry occurring during photolysis. EUV light (13.5 nm, 92 eV), however, first creates a photoelectron, and this electron, or its subsequent daughter electrons create most of the chemical changes that occur during exposure. Despite the importance of these electrons, the details surrounding the chemical events leading to acid production remain poorly understood. Previously reported experimental results using high PAG-loaded resists have demonstrated that up to five or six photoacids can be generated per incident photon. Until recently, only electron recombination events were thought to play a role in acid generation, requiring that at least as many secondary electrons are produced to yield a given number of acid molecules. However, the initial results we have obtained using a Monte Carlo-based modeling program, LESiS, demonstrate that only two to three secondary electrons are made per absorbed EUV photon. A more comprehensive understanding of EUV-induced acid generation is therefore needed for the development of higher performance resists

  11. Effective extreme ultraviolet radiation source based on laser-produced plasma in supersonic xenon jet

    Science.gov (United States)

    Bobashev, S. V.; Domracheva, I. V.; Petrenko, M. V.; Tumakaev, G. K.; Stepanova, Z. A.

    2007-04-01

    Development of highly effective debris free EUV (extreme ultraviolet) radiation source is an actual problem today. Experimental results on EUV output from the source based on laser-produced plasma in supersonic Xe jet have been obtained. The conversion efficiency is 0.08% at a wavelength of 13.5 nm (Δλ = 0.35 nm, 2π sterrad). The methods of optimization of gas-jet converter have been determined. Measurements of EUV radiation energy dependence on the laser energy and the target material (solid-state Cu, Mo, W, Ta and supersonic Xe jet) have been made. The conversion efficiency of laser-produced plasma (CELPP) has been determined and the experimental values have been obtained for different materials of the target.

  12. High Quality, Low-Scatter SiC Optics Suitable for Space-based UV & EUV Applications Project

    Data.gov (United States)

    National Aeronautics and Space Administration — SSG Precision Optronics proposes the development and demonstration of a new optical fabrication process for the production of EUV quality Silicon Carbide (SiC)...

  13. Worldwide Status of EUV Astronomy

    Science.gov (United States)

    Kowalski, Michael P.; Wood, K. S.; Barstow, M. A.

    2013-01-01

    The bulk of radiation from million-degree plasmas is emitted at EUV wavelengths, which include critical spectral features containing diagnostic information often not available at other wavelengths (e.g., He II Ly series 228-304 Å). Thus, EUV astrophysics (Barstow & Holberg 2003) presents opportunities for intriguing results obtainable with sensitive high-resolution spectroscopy and particularly applicable to hot plasmas in stellar coronae, white dwarfs and the interstellar medium. The US-built J-PEX spectrometer has flown twice on sounding rockets, observing and publishing results on two white dwarf targets (Cruddace et al. 2002, Barstow et al. 2005, Kowalski et al. 2011). Using multilayer-grating technology, J-PEX delivers both high effective area and the world's highest resolution in EUV, greater than Chandra at adjacent energies, but in a waveband Chandra cannot reach. However, the US program has been stalled by inability to obtain further NASA sounding rocket flights. A high level of technology readiness, plus important questions answerable solely with that technology, does not seem sufficient to win support. Nor is the substantial amount of resources invested into technology development over two decades, supported by NASA, DoD, and European partners. Proposals to turn the instrument or its technology into small satellite-based surveys have been made (results to be described) in the US and Europe, but the overall situation is precarious. The entire EUV astrophysics field is losing out on an opportunity, and is at risk of fading away, with forced discard of established assets. Only mobilization of the international EUV community -- unifying European, US, and perhaps others -- can reverse this situation. Our poster summarizes science quests within reach of proven technology, gives a current snapshot of that technology, and provides a summary of worldwide efforts to obtain necessary space access in NASA, ESA, and elsewhere. A process for building and maintaining

  14. EUV lithography imaging using novel pellicle membranes

    Science.gov (United States)

    Pollentier, Ivan; Vanpaemel, Johannes; Lee, Jae Uk; Adelmann, Christoph; Zahedmanesh, Houman; Huyghebaert, Cedric; Gallagher, Emily E.

    2016-03-01

    EUV mask protection against defects during use remains a challenge for EUV lithography. A stand-off protective membrane - a pellicle - is targeted to prevent yield losses in high volume manufacturing during handling and exposure, just as it is for 193nm lithography. The pellicle is thin enough to transmit EUV exposure light, yet strong enough to remain intact and hold any particles out of focus during exposure. The development of pellicles for EUV is much more challenging than for 193nm lithography for multiple reasons including: high absorption of most materials at EUV wavelength, pump-down sequences in the EUV vacuum system, and exposure to high intensity EUV light. To solve the problems of transmission and film durability, various options have been explored. In most cases a thin core film is considered, since the deposition process for this is well established and because it is the simplest option. The transmission specification typically dictates that membranes are very thin (~50nm or less), which makes both fabrication and film mechanical integrity difficult. As an alternative, low density films (e.g. including porosity) will allow thicker membranes for a given transmission specification, which is likely to improve film durability. The risk is that the porosity could influence the imaging. At imec, two cases of pellicle concepts based on reducing density have been assessed : (1) 3D-patterned SiN by directed self-assembly (DSA), and (2) carbon nanomaterials such as carbon nanotubes (CNT) and carbon nanosheets (CNS). The first case is based on SiN membranes that are 3D-patterned by Directed Self Assembly (DSA). The materials are tested relative to the primary specifications: EUV transmission and film durability. A risk assessment of printing performance is provided based on simulations of scattered energy. General conclusions on the efficacy of various approaches will provided.

  15. Quality control of EUVE databases

    Science.gov (United States)

    John, L. M.; Drake, J.

    1992-01-01

    The publicly accessible databases for the Extreme Ultraviolet Explorer include: the EUVE Archive mailserver; the CEA ftp site; the EUVE Guest Observer Mailserver; and the Astronomical Data System node. The EUVE Performance Assurance team is responsible for verifying that these public EUVE databases are working properly, and that the public availability of EUVE data contained therein does not infringe any data rights which may have been assigned. In this poster, we describe the Quality Assurance (QA) procedures we have developed from the approach of QA as a service organization, thus reflecting the overall EUVE philosophy of Quality Assurance integrated into normal operating procedures, rather than imposed as an external, post facto, control mechanism.

  16. On a Small-scale EUV Wave: The Driving Mechanism and the Associated Oscillating Filament

    Science.gov (United States)

    Shen, Yuandeng; Liu, Yu; Tian, Zhanjun; Qu, Zhining

    2017-12-01

    We present observations of a small-scale extreme-ultraviolet (EUV) wave that was associated with a mini-filament eruption and a GOES B1.9 micro-flare in the quiet-Sun region. The initiation of the event was due to the photospheric magnetic emergence and cancellation in the eruption source region, which first caused the ejection of a small plasma ejecta, then the ejecta impacted a nearby mini-filament and thereby led to the filament’s eruption and the associated flare. During the filament eruption, an EUV wave at a speed of 182{--}317 {km} {{{s}}}-1 was formed ahead of an expanding coronal loop, which propagated faster than the expanding loop and showed obvious deceleration and reflection during the propagation. In addition, the EUV wave further resulted in the transverse oscillation of a remote filament whose period and damping time are 15 and 60 minutes, respectively. Based on the observational results, we propose that the small-scale EUV wave should be a fast-mode magnetosonic wave that was driven by the expanding coronal loop. Moreover, with the application of filament seismology, it is estimated that the radial magnetic field strength is about 7 Gauss. The observations also suggest that small-scale EUV waves associated with miniature solar eruptions share similar driving mechanisms and observational characteristics with their large-scale counterparts.

  17. Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing

    Science.gov (United States)

    Cobb, Jonathan; Jang, Sunghoon; Ser, Junghoon; Kim, Insung; Yeap, Johnny; Lucas, Kevin; Do, Munhoe; Kim, Young-Chang

    2011-04-01

    Although technical issues remain to be resolved, EUV lithography is now a serious contender for critical layer patterning of upcoming 2X node memory and 14nm Logic technologies in manufacturing. If improvements continue in defectivity, throughput and resolution, then EUV lithography appears that it will be the most extendable and the cost-effective manufacturing lithography solution for sub-78nm pitch complex patterns. EUV lithography will be able to provide a significant relaxation in lithographic K1 factor (and a corresponding simplification of process complexity) vs. existing 193nm lithography. The increased K1 factor will result in some complexity reduction for mask synthesis flow elements (including illumination source shape optimization, design pre-processing, RET, OPC and OPC verification). However, EUV does add well known additional complexities and issues to mask synthesis flows such as across-lens shadowing variation, across reticle flare variation, new proximity effects to be modeled, significant increase in pre-OPC and fracture file size, etc. In this paper, we investigate the expected EUV-specific issues and new requirements for a production tapeout mask synthesis flow. The production EUV issues and new requirements are in the categories of additional physical effects to be corrected for; additional automation or flow steps needed; and increase in file size at different parts in the flow. For example, OASIS file sizes after OPC of 250GigaBytes (GB) and files sizes after mask data prep of greater than three TeraBytes (TB) are expected to be common. These huge file sizes will place significant stress on post-processing methods, OPC verification, mask data fracture, file read-in/read-out, data transfer between sites (e.g., to the maskshop), etc. With current methods and procedures, it is clear that the hours/days needed to complete EUV mask synthesis mask data flows would significantly increase if steps are not taken to make efficiency improvements

  18. Oxide Nanoparticle EUV (ONE) Photoresists: Current Understanding of the Unusual Patterning Mechanism

    KAUST Repository

    Jiang, Jing

    2015-01-01

    © 2015 SPST. In the past few years, industry has made significant progress to deliver a stable high power EUV scanner and a 100 W light source is now being tested on the manufacuring scale. The success of a high power EUV source demands a fast and high resolution EUV resist. However, chemcially amplied resists encounter unprecedented challenges beyond the 22 nm node due to resolution, roughness and sensitivity tradeoffs. Unless novel solutions for EUV resists are proposed and further optimzed, breakthroughs can hardly be achieved. Oxide nanoparticle EUV (ONE) resists stablized by organic ligands were originally proposed by Ober et al. Recently this work attracts more and more attention due to its extraordinanry EUV sensitivity. This new class of photoresist utilizes ligand cleavage with a ligand exchange mechanism to switch its solubilty for dual-tone patterning. Therefore, ligand selection of the nanoparticles is extremely important to its EUV performance.

  19. Solar wind- and EUV-dependent models for the shapes of the Martian plasma boundaries based on Mars Express measurements

    Science.gov (United States)

    Ramstad, Robin; Barabash, Stas; Futaana, Yoshifumi; Holmström, Mats

    2017-07-01

    The long operational life (2003-present) of Mars Express (MEX) has allowed the spacecraft to make plasma measurements in the Martian environment over a wide range of upstream conditions. We have analyzed ˜7000 MEX orbits, covering three orders of magnitude in solar wind dynamic pressure, with data from the on board Analyzer of Space Plasmas and Energetic Particles (ASPERA-3) package, mapping the locations where MEX crosses the main plasma boundaries, induced magnetosphere boundary (IMB), ionosphere boundary (IB), and bow shock (BS). A coincidence scheme was employed, where data from the Ion Mass Analyzer (IMA) and the Electron Spectrometer (ELS) had to agree for a positive boundary identification, which resulted in crossings from 1083 orbit segments that were used to create dynamic two-parameter (solar wind density, nsw, and velocity vsw) dependent global dynamic models for the IMB, IB, and BS. The modeled response is found to be individual to each boundary. The IMB scales mainly dependent on solar wind dynamic pressure and EUV intensity. The BS location closely follows the location of the IMB at the subsolar point, though under extremely low nsw and vsw the BS assumes a more oblique shape. The IB closely follows the IMB on the dayside and changes its nightside morphology with different trends for nsw and vsw. We also investigate the influence of extreme ultraviolet (EUV) radiation on the IMB and BS, finding that increased EUV intensity expands both boundaries.

  20. EUV laser produced and induced plasmas for nanolithography

    Science.gov (United States)

    Sizyuk, Tatyana; Hassanein, Ahmed

    2017-10-01

    EUV produced plasma sources are being extensively studied for the development of new technology for computer chips production. Challenging tasks include optimization of EUV source efficiency, producing powerful source in 2 percentage bandwidth around 13.5 nm for high volume manufacture (HVM), and increasing the lifetime of collecting optics. Mass-limited targets, such as small droplet, allow to reduce contamination of chamber environment and mirror surface damage. However, reducing droplet size limits EUV power output. Our analysis showed the requirement for the target parameters and chamber conditions to achieve 500 W EUV output for HVM. The HEIGHTS package was used for the simulations of laser produced plasma evolution starting from laser interaction with solid target, development and expansion of vapor/plasma plume with accurate optical data calculation, especially in narrow EUV region. Detailed 3D modeling of mix environment including evolution and interplay of plasma produced by lasers from Sn target and plasma produced by in-band and out-of-band EUV radiation in ambient gas, used for the collecting optics protection and cleaning, allowed predicting conditions in entire LPP system. Effect of these conditions on EUV photon absorption and collection was analyzed. This work is supported by the National Science Foundation, PIRE project.

  1. New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes

    NARCIS (Netherlands)

    Koshelev, K.N.; Krivtsun, V.M.; Ivanov, V.; Yakushev, O.; Chekmarev, A.; Koloshnikov, V.; Snegirev, E.; Medvedev, Viacheslav

    2012-01-01

    A new approach for discharge-produced plasma (DPP) extreme ultraviolet (EUV) sources based on the usage of two liquid metallic alloy jets as discharge electrodes has been proposed and tested. Discharge was ignited using laser ablation of one of the cathode jets. A system with two jet electrodes was

  2. Metal Oxide Nanoparticle Photoresists for EUV Patterning

    KAUST Repository

    Jiang, Jing

    2014-01-01

    © 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have achieved high resolution (∼22 nm) at a very high EUV sensitivity (4.2 mJ/cm2). Further investigations into the patterning process suggests a ligand displacement mechanism, wherein, any combination of a metal oxide with the correct ligand could generate patterns in the presence of the suitable photoactive compound. The current investigation extends this study by developing new nanoparticle compositions with transdimethylacrylic acid and o-toluic acid ligands. This study describes their synthesis and patterning performance under 248 nm KrF laser (DUV) and also under 13.5 nm EUV exposures (dimethylacrylate nanoparticles) for the new resist compositions.

  3. Surface roughness control by extreme ultraviolet (EUV) radiation

    Science.gov (United States)

    Ahad, Inam Ul; Obeidi, Muhannad Ahmed; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Brabazon, Dermot

    2017-10-01

    Surface roughness control of polymeric materials is often desirable in various biomedical engineering applications related to biocompatibility control, separation science and surface wettability control. In this study, Polyethylene terephthalate (PET) polymer films were irradiated with Extreme ultraviolet (EUV) photons in nitrogen environment and investigations were performed on surface roughness modification via EUV exposure. The samples were irradiated at 3 mm and 4 mm distance from the focal spot to investigate the effect of EUV fluence on topography. The topography of the EUV treated PET samples were studied by AFM. The detailed scanning was also performed on the sample irradiated at 3 mm. It was observed that the average surface roughness of PET samples was increased from 9 nm (pristine sample) to 280 nm and 253 nm for EUV irradiated samples. Detailed AFM studies confirmed the presence of 1.8 mm wide period U-shaped channels in EUV exposed PET samples. The walls of the channels were having FWHM of about 0.4 mm. The channels were created due to translatory movements of the sample in horizontal and transverse directions during the EUV exposure. The increased surface roughness is useful for many applications. The nanoscale channels fabricated by EUV exposure could be interesting for microfluidic applications based on lab-on-a-chip (LOC) devices.

  4. Design requirements for a stand alone EUV interferometer

    Science.gov (United States)

    Michallon, Ph.; Constancias, C.; Lagrange, A.; Dalzotto, B.

    2008-03-01

    EUV lithography is expected to be inserted for the 32/22 nm nodes with possible extension below. EUV resist availability remains one of the main issues to be resolved. There is an urgent need to provide suitable tools to accelerate resist development and to achieve resolution, LER and sensitivity specifications simultaneously. An interferometer lithography tool offers advantages regarding conventional EUV exposure tool. It allows the evaluation of resists, free from the deficiencies of optics and mask which are limiting the achieved resolution. Traditionally, a dedicated beam line from a synchrotron, with limited access, is used as a light source in EUV interference lithography. This paper identifies the technology locks to develop a stand alone EUV interferometer using a compact EUV source. It will describe the theoretical solutions adopted and especially look at the feasibility according to available technologies. EUV sources available on the market have been evaluated in terms of power level, source size, spatial coherency, dose uniformity, accuracy, stability and reproducibility. According to the EUV source characteristics, several optic designs were studied (simple or double gratings). For each of these solutions, the source and collimation optic specifications have been determined. To reduce the exposure time, a new grating technology will also be presented allowing to significantly increasing the transmission system efficiency. The optical grating designs were studied to allow multi-pitch resolution print on the same exposure without any focus adjustment. Finally micro mechanical system supporting the gratings was studied integrating the issues due to vacuum environment, alignment capability, motion precision, automation and metrology to ensure the needed placement control between gratings and wafer. A similar study was carried out for the collimation-optics mechanical support which depends on the source characteristics.

  5. Contamination Effects on EUV Optics

    Science.gov (United States)

    Tveekrem, J.

    1999-01-01

    During ground-based assembly and upon exposure to the space environment, optical surfaces accumulate both particles and molecular condensibles, inevitably resulting in degradation of optical instrument performance. Currently, this performance degradation (and the resulting end-of-life instrument performance) cannot be predicted with sufficient accuracy using existing software tools. Optical design codes exist to calculate instrument performance, but these codes generally assume uncontaminated optical surfaces. Contamination models exist which predict approximate end-of-life contamination levels, but the optical effects of these contamination levels can not be quantified without detailed information about the optical constants and scattering properties of the contaminant. The problem is particularly pronounced in the extreme ultraviolet (EUV, 300-1,200 A) and far (FUV, 1,200-2,000 A) regimes due to a lack of data and a lack of knowledge of the detailed physical and chemical processes involved. Yet it is in precisely these wavelength regimes that accurate predictions are most important, because EUV/FUV instruments are extremely sensitive to contamination.

  6. EUV Cross-Calibration Strategies for the GOES-R SUVI

    Science.gov (United States)

    Darnel, Jonathan; Seaton, Daniel

    2016-10-01

    The challenges of maintaining calibration for solar EUV instrumentation is well-known. The lack of standard calibration sources and the fact that most solar EUV telescopes are incapable of utilizing bright astronomical EUV sources for calibration make knowledge of instrument performance quite difficult. In the recent past, calibration rocket underflights have helped establish a calibration baseline. The EVE instrument on SDO for a time provided well-calibrated, high spectral resolution solar spectra for a broad range of the EUV, but has suffered a loss of coverage at the shorter wavelengths. NOAA's Solar UltraViolet Imager (SUVI), a solar EUV imager with similarities to SDO/AIA, will provide solar imagery over nearly an entire solar cycle. In order to maintain the scientific value of the SUVI's dataset, novel approaches to calibration are necessary. Here we demonstrate a suite of methods to cross-calibrate SUVI against other solar EUV instruments through the use of proxy solar spectra.

  7. EUV lithography: NXE platform performance overview

    Science.gov (United States)

    Peeters, Rudy; Lok, Sjoerd; Mallman, Joerg; van Noordenburg, Martijn; Harned, Noreen; Kuerz, Peter; Lowisch, Martin; van Setten, Eelco; Schiffelers, Guido; Pirati, Alberto; Stoeldraijer, Judon; Brandt, David; Farrar, Nigel; Fomenkov, Igor; Boom, Herman; Meiling, Hans; Kool, Ron

    2014-04-01

    The first NXE3300B systems have been qualified and shipped to customers. The NXE:3300B is ASML's third generation EUV system and has an NA of 0.33. It succeeds the NXE:3100 system (NA of 0.25), which has allowed customers to gain valuable EUV experience. Good overlay and imaging performance has been shown on the NXE:3300B system in line with 22nm device requirements. Full wafer CDU performance of Manufacturing. With the development of the MOPA+prepulse operation of the source, steps in power have been made, and with automated control the sources have been prepared to be used in a preproduction fab environment. Flexible pupil formation is under development for the NXE:3300B which will extend the usage of the system in HVM, and the resolution for the full system performance can be extended to 16nm. Further improvements in defectivity performance have been made, while in parallel full-scale pellicles are being developed. In this paper we will discuss the current NXE:3300B performance, its future enhancements and the recent progress in EUV source performance.

  8. Film quantum yields of EUV& ultra-high PAG photoresists

    Energy Technology Data Exchange (ETDEWEB)

    Hassanein, Elsayed; Higgins, Craig; Naulleau, Patrick; Matyi, Richard; Gallatin, Greg; Denbeaux, Gregory; Antohe, Alin; Thackery, Jim; Spear, Kathleen; Szmanda, Charles; Anderson, Christopher N.; Niakoula, Dimitra; Malloy, Matthew; Khurshid, Anwar; Montgomery, Cecilia; Piscani, Emil C.; Rudack, Andrew; Byers, Jeff; Ma, Andy; Dean, Kim; Brainard, Robert

    2008-01-10

    Base titration methods are used to determine C-parameters for three industrial EUV photoresist platforms (EUV-2D, MET-2D, XP5496) and twenty academic EUV photoresist platforms. X-ray reflectometry is used to measure the density of these resists, and leads to the determination of absorbance and film quantum yields (FQY). Ultrahigh levels ofPAG show divergent mechanisms for production of photo acids beyond PAG concentrations of 0.35 moles/liter. The FQY of sulfonium PAGs level off, whereas resists prepared with iodonium PAG show FQY s that increase beyond PAG concentrations of 0.35 moles/liter, reaching record highs of 8-13 acids generatedlEUV photons absorbed.

  9. Mars Thermospheric Temperature Sensitivity to Solar EUV Forcing from the MAVEN EUV Monitor

    Science.gov (United States)

    Thiemann, Ed; Eparvier, Francis; Andersson, Laila; Pilinski, Marcin; Chamberlin, Phillip; Fowler, Christopher; MAVEN Extreme Ultraviolet Monitor Team, MAVEN Langmuir Probe and Waves Team

    2017-10-01

    Solar extreme ultraviolet (EUV) radiation is the primary heat source for the Mars thermosphere, and the primary source of long-term temperature variability. The Mars obliquity, dust cycle, tides and waves also drive thermospheric temperature variability; and it is important to quantify the role of each in order to understand processes in the upper atmosphere today and, ultimately, the evolution of Mars climate over time. Although EUV radiation is the dominant heating mechanism, accurately measuring the thermospheric temperature sensitivity to EUV forcing has remained elusive, in part, because Mars thermospheric temperature varies dramatically with latitude and local time (LT), ranging from 150K on the nightside to 300K on the dayside. It follows that studies of thermospheric variability must control for location.Instruments onboard the Mars Atmosphere and Volatile EvolutioN (MAVEN) orbiter have begun to characterize thermospheric temperature sensitivity to EUV forcing. Bougher et al. [2017] used measurements from the Imaging Ultraviolet Spectrograph (IUVS) and the Neutral Gas and Ion Mass Spectrometer (NGIMS) to characterize solar activity trends in the thermosphere with some success. However, aside from restricting measurements to solar zenith angles (SZAs) below 75 degrees, they were unable to control for latitude and LT because repeat-track observations from either instrument were limited or unavailable.The MAVEN EUV Monitor (EUVM) has recently demonstrated the capability to measure thermospheric density from 100 to 200 km with solar occultations of its 17-22 nm channel. These new density measurements are ideal for tracking the long-term thermospheric temperature variability because they are inherently constrained to either 06:00 or 18:00 LT, and the orbit has precessed to include a range of ecliptic latitudes, a number of which have been revisited multiple times over 2.5 years. In this study we present, for the first-time, measurements of thermospheric

  10. Energy effective dual-pulse bispectral laser for EUV lithography

    Science.gov (United States)

    Zhevlakov, A. P.; Seisyan, R. P.; Bespalov, V. G.; Elizarov, V. V.; Grishkanich, A. S.; Kascheev, S. V.; Sidorov, I. S.

    2016-03-01

    The power consumption in the two-pulse bispectral primary source could be substantially decreased by replacing the SRS converters from 1.06 μm into 10.6 μm wavelength as the preamplifier cascades in CO2 laser channel at the same efficiency radiation of EUV source. The creation of high volume manufacturing lithography facilities with the technological standard of 10-20 nm is related to the implementation of resist exposure modes with pulse repetition rate of 100 kHz. Low power consumption of the proposed scheme makes it promising for the creation of LPP EUV sources.

  11. EUVE Observations of Nonmagnetic Cataclysmic Variables

    Energy Technology Data Exchange (ETDEWEB)

    Mauche, C W

    2001-09-05

    The authors summarize EUVE's contribution to the study of the boundary layer emission of high accretion-rate nonmagnetic cataclysmic variables, especially the dwarf novae SS Cyg, U Gem, VW Hyi, and OY Car in outburst. They discuss the optical and EUV light curves of dwarf nova outbursts, the quasi-coherent oscillations of the EUV flux of SS Cyg, the EUV spectra of dwarf novae, and the future of EUV observations of cataclysmic variables.

  12. Radiometry for the EUV lithography; Radiometrie fuer die EUV-Lithographie

    Energy Technology Data Exchange (ETDEWEB)

    Scholze, Frank [Physikalisch-Technische Bundesanstalt (PTB), Berlin (Germany). Arbeitsgruppe ' EUV-Radiometrie' ; Laubis, Christian; Barboutis, Annett; Buchholz, Christian; Fischer, Andreas; Puls, Jana; Stadelhoff, Christian

    2014-12-15

    The EUV reflectrometry at the PTB storage BESSY I and BESSY II is described. Results on the reflectivities of some EUV mirrors are presented. Finally the spectral sensitivities of different photodiodes used as EUV detectors are presented. (HSI)

  13. State-of-the-art EUV materials and processes for the 7nm node and beyond

    Science.gov (United States)

    Buitrago, Elizabeth; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Vockenhuber, Michaela; Mochi, Iacopo; Fallica, Roberto; Tasdemir, Zuhal; Ekinci, Yasin

    2017-03-01

    Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) being the most likely candidate to manufacture electronic devices for future technology nodes is to be introduced in high volume manufacturing (HVM) at the 7 nm logic node, at least at critical lithography levels. With this impending introduction, it is clear that excellent resist performance at ultra-high printing resolutions (below 20 nm line/space L/S) is ever more pressing. Nonetheless, EUVL has faced many technical challenges towards this paradigm shift to a new lithography wavelength platform. Since the inception of chemically amplified resists (CARs) they have been the base upon which state-of-the art photoresist technology has been developed from. Resist performance as measured in terms of printing resolution (R), line edge roughness (LER), sensitivity (D or exposure dose) and exposure latitude (EL) needs to be improved but there are well known trade-off relationships (LRS trade-off) among these parameters for CARs that hamper their simultaneous enhancement. Here, we present some of the most promising EUVL materials tested by EUV interference lithography (EUV-IL) with the aim of resolving features down to 11 nm half-pitch (HP), while focusing on resist performance at 16 and 13 nm HP as needed for the 7 and 5 nm node, respectively. EUV-IL has enabled the characterization and development of new resist materials before commercial EUV exposure tools become available and is therefore a powerful research and development tool. With EUV-IL, highresolution periodic images can be printed by the interference of two or more spatially coherent beams through a transmission-diffraction grating mask. For this reason, our experiments have been performed by EUV-IL at Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI). Having the opportunity to test hundreds of EUVL materials from vendors and research partners from all over the world, PSI is able to give a global update on some of the

  14. Determining the Critcial Size of EUV Mask Substrate Defects

    Energy Technology Data Exchange (ETDEWEB)

    Mccall, Monnikue M; Han, Hakseung; Cho, Wonil; Goldberg, Kenneth; Gullikson, Eric; Jeon, Chan-Uk; Wurm, Stefan

    2008-02-28

    Determining the printability of substrate defects beneath the extreme ultraviolet (EUV) reflecting multilayer stack is an important issue in EUVL lithography. Several simulation studies have been performed in the past to determine the tolerable defect size on EUV mask blank substrates but the industry still has no exact specification based on real printability tests. Therefore, it is imperative to experimentally determine the printability of small defects on a mask blanks that are caused by substrate defects using direct printing of programmed substrate defect in an EUV exposure tool. SEMATECH fabricated bump type program defect masks using standard electron beam lithography and performed printing tests with the masks using an EUV exposure tool. Defect images were also captured using SEMATECH's Berkeley Actinic Imaging Tool in order to compare aerial defect images with secondary electron microscope images from exposed wafers. In this paper, a comprehensive understanding of substrate defect printability will be presented and printability specifications of EUV mask substrate defects will be discussed.

  15. Determining the critical size of EUV mask substrate defects

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Gullikson, Eric M.; Han, Hakseung; Cho, Wonil; Jeon, Chan-Uk; Wurm, Stefan

    2008-05-26

    Determining the printability of substrate defects beneath the extreme ultraviolet (EUV) reflecting multilayer stack is an important issue in EUVL lithography. Several simulation studies have been performed in the past to determine the tolerable defect size on EUV mask blank substrates but the industry still has no exact specification based on real printability tests. Therefore, it is imperative to experimentally determine the printability of small defects on a mask blanks that are caused by substrate defects using direct printing of programmed substrate defect in an EUV exposure tools. SEMATECH fabricated bump type program defect masks using standard electron beam lithography and performed printing tests with the masks using an EUV exposure tool. Defect images were also captured using SEMATECH's Berkeley Actinic Imaging Tool in order to compare aerial defect images with secondary electron microscope images from exposed wafers. In this paper, a comprehensive understanding of substrate defect printability will be presented and printability specifications of EUV mask substrate defects will be discussed.

  16. Metrology qualification of EUV resists

    Science.gov (United States)

    Gershtein, Liraz; Peltinov, Ram; Ventola, Stefano; Masia, Claudio; Xing, Chanjuan

    2010-03-01

    The ASML extreme ultraviolet lithography (EUV) alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development for sub-40-nm technology. Two exposure tools are installed in two research centers. The main topic of this paper is the examination of the measured pattern roughness LER contributed by measurement (SEM), exposure (EUV exposure tool) and the resists itself. The authors also examined suspected metrology SEM challenges on different EUV resist types exposed by one of the EUV demo tools. Standard CD SEM tests, such as precision and shrinkage were performed in order to get best working conditions. As part of the research, special attention was given to expected electron - material interactions, such as resist's slimming, low contrast and contamination build up on both lines. LER was analyzed in order to determine separately the contribution effect of the exposure tool and the different resists. Additional comparison was performed on different CDs with different orientations and densities.

  17. Statistical simulation of photoresists at EUV and ArF

    Science.gov (United States)

    Biafore, John J.; Smith, Mark D.; Mack, Chris A.; Thackeray, James W.; Gronheid, Roel; Robertson, Stewart A.; Graves, Trey; Blankenship, David

    2009-03-01

    Requirements of resist modeling strategies for EUV and low-k1 ArF nanolithography continue to become more stringent. Resist designers are consistently faced with the task of reducing exposure dose and line roughness while simultaneously improving exposure latitude, depth-of-focus and ultimate resolution. In this work, we briefly discuss a next-generation resist model for the prediction of statistical resist responses such as line-edge roughness, line-width roughness and CD variability, as well as base lithographic responses such as exposure latitude. The model's parameterized fit to experimental data from a state-of-the art polymer-bound PAG resist irradiated at ArF and EUV will be shown. The probabilistic computation of acid generation at ArF and EUV will be discussed. The factors influencing the hypothesized primary cause of resist roughness, acid shot noise, are discussed.

  18. Performance of the ASML EUV Alpha Demo Tool

    Science.gov (United States)

    Hermans, Jan V.; Hendrickx, Eric; Laidler, David; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Anne-Marie

    2010-04-01

    The 22nm technology node is the target for insertion of Extreme Ultra-Violet (EUV) lithography into pre-production. To prepare this insertion, the issues that arise with the use of an EUV lithographic scanner in a pre-production environment need to be addressed. To gain better understanding of the issues that come with an EUV lithographic scanner, the Alpha Demo Tool (ADT) from ASML was installed at IMEC and is now in use since mid of 2008. In July 2009, the source was upgraded to a 170W/2π source to allow for higher uptime and wafer output by means of the semi-automatic tin refill. Also a new advanced resist, the SEVR-59 resist was introduced after the installation of the 170W/2π source to allow printing of 32nm Lines-Spaces (LS). After these changes, the ADT has been monitored closely with respect to the imaging performance. In this paper, we report on both the CD fingerprint analysis and the exposure tool stability. For 32nm dense LS, the ADT shows a wafer CD Uniformity (CDU) of 2.5nm 3σ, without any corrections for process or reticle. As for 40nm LS, the wafer CDU is correlated to different factors that are known to influence the CD fingerprint from traditional lithography: reticle CD error, slit intensity uniformity, focal plane deviation but also EUV specific reticle shadowing. The ADT shows excellent wafer-to-wafer stability (tool (using the same etched silicon wafers as a reference). Below 32nm, the ADT shows good wafer CDU for 30nm dense LS (60nm pitch). First 27nm dense line CDU data are achieved (54nm pitch). The results indicate that the ADT can be used effectively for EUV process development before installation of the pre-production tool, the ASML NXE:3100 at IMEC.

  19. A swirling flare-related EUV jet

    Science.gov (United States)

    Zhang, Q. M.; Ji, H. S.

    2014-01-01

    Aims: We report our observations of a swirling flare-related extreme-ultraviolet (EUV) jet on 2011 October 15 at the edge of NOAA active region 11314. Methods: We used the multiwavelength observations in the EUV passbands from the Atmospheric Imaging Assembly (AIA) aboard the Solar Dynamics Observatory (SDO). We extracted a wide slit along the jet axis and 12 thin slits across its axis to investigate the longitudinal motion and transverse rotation. We also used data from the Extreme-Ultraviolet Imager (EUVI) aboard the Solar TErrestrial RElations Observatory (STEREO) spacecraft to investigate the three-dimensional (3D) structure of the jet. Ground-based Hα images from the El Teide Observatory, a member of the Global Oscillation Network Group (GONG), provide a good opportunity to explore the relationship between the cool surge and the hot jet. Line-of-sight magnetograms from the Helioseismic and Magnetic Imager (HMI) aboard SDO enable us to study the magnetic evolution of the flare/jet event. We carried out potential-field extrapolation to calculate the magnetic configuration associated with the jet. Results: The onset of jet eruption coincided with the start time of the C1.6 flare impulsive phase. The initial velocity and acceleration of the longitudinal motion were 254 ± 10 km s-1 and -97 ± 5 m s-2, respectively. The jet presented helical structure and transverse swirling motion at the beginning of its eruption. The counter-clockwise rotation slowed down from an average velocity of ~122 km s-1 to ~80 km s-1. The interwinding thick threads of the jet untwisted into multiple thin threads during the rotation that lasted for one cycle with a period of ~7 min and an amplitude that increases from ~3.2 Mm at the bottom to ~11 Mm at the upper part. Afterwards, the curtain-like leading edge of the jet continued rising without rotation, leaving a dimming region behind, before falling back to the solar surface. The appearance/disappearance of dimming corresponded to the

  20. Benchmarking EUV mask inspection beyond 0.25 NA

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Anderson, Erik H.; Rekawa, Seno B.; Kemp, Charles D.; Huh, S.; Han, H.-S.; Naulleau, P.; Gunion, R.F.

    2008-09-18

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV-wavelength mask inspection microscope designed for direct aerial image measurements, and pre-commercial EUV mask research. Operating on a synchrotron bending magnet beamline, the AIT uses an off-axis Fresnel zoneplate lens to project a high-magnification EUV image directly onto a CCD camera. We present the results of recent system upgrades that have improved the imaging resolution, illumination uniformity, and partial coherence. Benchmarking tests show image contrast above 75% for 100-nm mask features, and significant improvements and across the full range of measured sizes. The zoneplate lens has been replaced by an array of user-selectable zoneplates with higher magnification and NA values up to 0.0875, emulating the spatial resolution of a 0.35-NA 4 x EUV stepper. Illumination uniformity is above 90% for mask areas 2-{micro}m-wide and smaller. An angle-scanning mirror reduces the high coherence of the synchrotron beamline light source giving measured {sigma} values of approximately 0.125 at 0.0875 NA.

  1. Actinic EUV mask inspection beyond 0.25 NA

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Anderson, Erik H.; Rekawa, Seno. B.; Kemp, Charles D.; Huh, S.; Han, H.-S.; Naulleau, P.; Huh, S.

    2008-03-24

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV-wavelength mask inspection microscope designed for direct aerial image measurements, and pre-commercial EUV mask research. Operating on a synchrotron bending magnet beamline, the AIT uses an off-axis Fresnel zoneplate lens to project a high-magnification EUV image directly onto a CCD camera. We present the results of recent system upgrades that have improved the imaging resolution, illumination uniformity, and partial coherence. Benchmarking tests show image contrast above 75% for 100-nm mask features, and significant improvements and across the full range of measured sizes. The zoneplate lens has been replaced by an array of user-selectable zoneplates with higher magnification and NA values up to 0.0875, emulating the spatial resolution of a 0.35-NA 4x EUV stepper. Illumination uniformity is above 90% for mask areas 2-{micro}m-wide and smaller. An angle-scanning mirror reduces the high coherence of the synchrotron beamline light source giving measured {sigma} values of approximately 0.125 at 0.0875 NA.

  2. Correlations Between Variations in Solar EUV and Soft X-Ray Irradiance and Photoelectron Energy Spectra Observed on Mars and Earth

    Science.gov (United States)

    Peterson, W. K.; Brain, D. A.; Mitchell, D. L.; Bailey, S. M.; Chamberlin, P. C.

    2013-01-01

    Solar extreme ultraviolet (EUV; 10-120 nm) and soft X-ray (XUV; 0-10 nm) radiation are major heat sources for the Mars thermosphere as well as the primary source of ionization that creates the ionosphere. In investigations of Mars thermospheric chemistry and dynamics, solar irradiance models are used to account for variations in this radiation. Because of limited proxies, irradiance models do a poor job of tracking the significant variations in irradiance intensity in the EUV and XUV ranges over solar rotation time scales when the Mars-Sun-Earth angle is large. Recent results from Earth observations show that variations in photoelectron energy spectra are useful monitors of EUV and XUV irradiance variability. Here we investigate photoelectron energy spectra observed by the Mars Global Surveyor (MGS) Electron Reflectometer (ER) and the FAST satellite during the interval in 2005 when Earth, Mars, and the Sun were aligned. The Earth photoelectron data in selected bands correlate well with calculations based on 1 nm resolution observations above 27 nm supplemented by broadband observations and a solar model in the 0-27 nm range. At Mars, we find that instrumental and orbital limitations to the identifications of photoelectron energy spectra in MGS/ER data preclude their use as a monitor of solar EUV and XUV variability. However, observations with higher temporal and energy resolution obtained at lower altitudes on Mars might allow the separation of the solar wind and ionospheric components of electron energy spectra so that they could be used as reliable monitors of variations in solar EUV and XUV irradiance than the time shifted, Earth-based, F(10.7) index currently used.

  3. Highly Stable, Large Format EUV Imager Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Higher detection efficiency and better radiation tolerance imagers are needed for the next generation of EUV instruments. Previously, CCD technology has demonstrated...

  4. The EUV spectrophotometer on Atmosphere Explorer.

    Science.gov (United States)

    Hinteregger, H. E.; Bedo, D. E.; Manson, J. E.

    1973-01-01

    An extreme ultraviolet (EUV) spectrophotometer for measurements of solar radiation at wavelengths ranging from 140 to 1850 A will be included in the payload of each of the three Atmosphere-Explorer (AE) missions, AE-C, -D, and -E. The instrument consists of 24 grating monochromators, 12 of which can be telecommanded either to execute 128-step scans each covering a relatively small section of the total spectrophotometer wavelength range or to maintain fixed (command-selected) wavelength positions. The remaining 12 nonscan monochromators operate at permanently fixed wavelengths and view only a small fraction of the solar disk except for one viewing the whole sun in H Lyman alpha. Ten of the 12 scan-capable monochromators also view the entire solar disk since their primary function is to measure the total fluxes independent of the distribution of sources across the solar disk.

  5. Wavelength dependence of prepulse laser beams on EUV emission from CO2 reheated Sn plasma

    Science.gov (United States)

    Freeman, J. R.; Harilal, S. S.; Sizyuk, T.; Hassanein, A.; Rice, B.

    2012-03-01

    Extreme ultraviolet (EUV) emission from laser-produced plasmas (LPP) centered at 13.5 nm is considered a leading candidate for the light source in future lithography systems. Tin is currently the best material for generating this EUV emission since it emits strongly within the 13.5 nm region due to its various ionic states (Sn8+-Sn14+). Highly efficient and low-debris LPPs are a pre-requisite for their use as light sources for EUV lithography. Tin plasmas generate debris that can damage collection optics over time. Techniques to mitigate debris are needed to extend the lifetime of these components and the system. Optimization of plasma conditions is necessary for increasing EUV emission and enhancing conversion efficiency (CE). Improving the source CE is necessary in order to reduce the cost of ownership and hence, develop a commercially viable lithography system for the semiconductor industry. One method to accomplish this is to reheat pre-formed plasma with a laser pulse to enhance EUV emission. This enhancement is achieved by controlling those plasma conditions necessary for optimizing EUV emission. We investigated the role of prepulse laser wavelength on prepulse plume formation and EUV in-band signal enhancement. A 6 ns Nd:YAG laser operating at 1064 nm and 266 nm was used for generating the prepulse plume. The expanding plume was then reheated by a 35 ns CO2 laser operating at 10.6 μm. The role of prepulse wavelength and energy on EUV conversion efficiency is discussed.

  6. Integrated approach to improving local CD uniformity in EUV patterning

    Science.gov (United States)

    Liang, Andrew; Hermans, Jan; Tran, Timothy; Viatkina, Katja; Liang, Chen-Wei; Ward, Brandon; Chuang, Steven; Yu, Jengyi; Harm, Greg; Vandereyken, Jelle; Rio, David; Kubis, Michael; Tan, Samantha; Dusa, Mircea; Singhal, Akhil; van Schravendijk, Bart; Dixit, Girish; Shamma, Nader

    2017-03-01

    Extreme ultraviolet (EUV) lithography is crucial to enabling technology scaling in pitch and critical dimension (CD). Currently, one of the key challenges of introducing EUV lithography to high volume manufacturing (HVM) is throughput, which requires high source power and high sensitivity chemically amplified photoresists. Important limiters of high sensitivity chemically amplified resists (CAR) are the effects of photon shot noise and resist blur on the number of photons received and of photoacids generated per feature, especially at the pitches required for 7 nm and 5 nm advanced technology nodes. These stochastic effects are reflected in via structures as hole-to-hole CD variation or local CD uniformity (LCDU). Here, we demonstrate a synergy of film stack deposition, EUV lithography, and plasma etch techniques to improve LCDU, which allows the use of high sensitivity resists required for the introduction of EUV HVM. Thus, to improve LCDU to a level required by 5 nm node and beyond, film stack deposition, EUV lithography, and plasma etch processes were combined and co-optimized to enhance LCDU reduction from synergies. Test wafers were created by depositing a pattern transfer stack on a substrate representative of a 5 nm node target layer. The pattern transfer stack consisted of an atomically smooth adhesion layer and two hardmasks and was deposited using the Lam VECTOR PECVD product family. These layers were designed to mitigate hole roughness, absorb out-of-band radiation, and provide additional outlets for etch to improve LCDU and control hole CD. These wafers were then exposed through an ASML NXE3350B EUV scanner using a variety of advanced positive tone EUV CAR. They were finally etched to the target substrate using Lam Flex dielectric etch and Kiyo conductor etch systems. Metrology methodologies to assess dimensional metrics as well as chip performance and defectivity were investigated to enable repeatable patterning process development. Illumination

  7. Scaling EUV and X-ray Thomson sources to optical free-electron laser operation with traveling-wave Thomson scattering (Conference Presentation)

    Science.gov (United States)

    Steiniger, Klaus; Albach, Daniel; Debus, Alexander; Loeser, Markus; Pausch, Richard; Roeser, Fabian; Schramm, Ulrich; Siebold, Matthias; Bussmann, Michael

    2017-05-01

    Traveling-Wave Thomson-Scattering (TWTS) allows for the realization of optical free-electron lasers (OFELs) from the interaction of short, high-power laser pulses with brilliant relativistic electron bunches. The laser field provides the optical undulator which is traversed by the electrons. In order to achieve coherent amplification of radiation through electron microbunching the interaction between electrons and laser must be maintained over hundreds to thousands of undulator periods. Traveling-Wave Thomson-Scattering is the only scattering geometry so far allowing for the realization of optical undulators of this length which is at the same time scalable from extreme ultraviolet to X-ray photon energies. TWTS is also applicable for the realization of incoherent high peak brightness hard X-ray to gamma-ray sources which can provide orders of magnitude higher photon output than classic head-on Thomson sources. In contrast to head-on Thomson sources TWTS employs a side-scattering geometry where laser and electron propagation direction of motion enclose an angle. Tilting the laser pulse front with respect to the wave front by half of this interaction angle optimizes electron and laser pulse overlap. In the side-scattering geometry the tilt of the pulse-front compensates the spatial offset between electrons and laser pulse-front which would be present otherwise for an electron bunch far from the interaction point where it overlaps with the laser pulse center. Thus the laser pulse-front tilt ensures continuous overlap between laser pulse and electrons while these traverse the laser pulse cross-sectional area. This allows to control the interaction distance in TWTS by the laser pulse width rather than laser pulse duration as is the case for head-on Thomson scattering. Utilizing petawatt class laser pulses with millimeter to centimeter scale width allows for the realization of compact optical undulators with thousands of periods. When laser pulses for TWTS are prepared

  8. Experimental and theoretical study on emission spectra of a nitrogen photoionized plasma induced by intense EUV pulses

    Directory of Open Access Journals (Sweden)

    Saber Ismail

    2018-01-01

    Full Text Available Spectral lines of low-temperature nitrogen photoionized plasma were investigated. The photoionized plasma was created in the result of irradiation N2 gas using laser plasma EUV radiation pulses. The source was based on a 10J/10ns Nd:YAG (λ = 1064 nm laser system and a gas puff target. The EUV radiation pulses were collected and focused using a grazing incidence multifoil EUV collector. The emission spectra were measured in the ultraviolet and visible (UV/Vis range. It was found that the plasma emission lines in the lower region of the UV range are relativley weak. Nonetheless, a part of the spectra contains strong molecular band in the 300 - 430 nm originated from second positive and first negative systems band transitions of nitrogen. These molecular band transitions were identified using a code for study the diatomic molecules, LIFBASE. The vibrational band of Δv = 0 and ±1 transitions were significantly populated than of that with Δv = ±2 and 3 transitions. A comparison of the calculated and measured spectrum is presented. With an assumption of a local thermodynamic equilibrium (LTE, the vibrational temperature was determined from the integrated band intensities with the help of the Boltzmann plot method and compared to the temperature predicted by SPECAIR and LIFBASE simulations. A summary of the results and the variations in the vibrational temperatures was discussed.

  9. Experimental and theoretical study on emission spectra of a nitrogen photoionized plasma induced by intense EUV pulses

    Science.gov (United States)

    Saber, Ismail; Bartnik, Andrzej; Skrzeczanowski, Wojciech; Wachulak, Przemyslaw; Jarocki, Roman; Fiedorowicz, Henryk; Limpouch, Jiri

    2018-01-01

    Spectral lines of low-temperature nitrogen photoionized plasma were investigated. The photoionized plasma was created in the result of irradiation N2 gas using laser plasma EUV radiation pulses. The source was based on a 10J/10ns Nd:YAG (λ = 1064 nm) laser system and a gas puff target. The EUV radiation pulses were collected and focused using a grazing incidence multifoil EUV collector. The emission spectra were measured in the ultraviolet and visible (UV/Vis) range. It was found that the plasma emission lines in the lower region of the UV range are relativley weak. Nonetheless, a part of the spectra contains strong molecular band in the 300 - 430 nm originated from second positive and first negative systems band transitions of nitrogen. These molecular band transitions were identified using a code for study the diatomic molecules, LIFBASE. The vibrational band of Δv = 0 and ±1 transitions were significantly populated than of that with Δv = ±2 and 3 transitions. A comparison of the calculated and measured spectrum is presented. With an assumption of a local thermodynamic equilibrium (LTE), the vibrational temperature was determined from the integrated band intensities with the help of the Boltzmann plot method and compared to the temperature predicted by SPECAIR and LIFBASE simulations. A summary of the results and the variations in the vibrational temperatures was discussed.

  10. Modeling of EUV emission and conversion efficiency from laser-produced tin plasmas for nanolithography

    Science.gov (United States)

    Harilal, S. S.; MacFarlane, J. J.; Golovkin, I. E.; Woodruff, P. R.; Wang, P.

    2008-03-01

    Extreme ultraviolet lithography (EUVL) is a leading candidate for use in next-generation high volume manufacturing of semiconductor chips that require feature sizes less than 32 nm. The essential requirement for enabling this technology is to have a reliable, clean and powerful EUV source which efficiently emits light at a wavelength of 13.5 nm. Laser-produced plasma EUV sources are strong candidates for use in EUVL light source systems. The development and optimization of high-efficiency EUV sources requires not only well-diagnosed experiments, but also a good understanding of the physical processes affecting the emitting plasma, which can be achieved with the help of accurate numerical simulation tools. Here, we investigate the radiative properties of tin and tin-doped foam plasmas heated by 1.06 μm laser beams with 10 ns pulse widths. Results from simulations are compared with experimental conversion efficiencies and emission spectra.

  11. EUV mask process specifics and development challenges

    Science.gov (United States)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  12. Study of Novel EUV Absorber : Nickel and Nickel Oxide

    Energy Technology Data Exchange (ETDEWEB)

    Woo, Dong Gon; Kim, Jung Hwan; Kim, Jung Sik; Hong, Seongchul; Ahn, Jinho [Hanyang University, Seoul (Korea, Republic of)

    2017-03-15

    The shadowing effect is one of the most urgent issues yet to be solved in high-volume manufacturing using extreme ultraviolet lithography (EUVL). Many studies have been conducted to mitigate the unexpected results caused by shadowing effects. The simplest way to mitigate the shadowing effect is to reduce the thickness of the absorber. Since nickel has high extinction coefficients in the EUV wavelengths, it is one of more promising absorber material candidates. A Ni based absorber exhibited imaging performance comparable to a Tantalum nitride absorber. However, the Ni-based absorber showed a dramatic reduction in horizontal-vertical critical dimension (H-V CD) bias. Therefore, limitations in fabricating a EUV mask can be mitigated by using the Ni based absorber.

  13. Carbon contamination topography analysis of EUV masks

    Energy Technology Data Exchange (ETDEWEB)

    Fan, Y.-J.; Yankulin, L.; Thomas, P.; Mbanaso, C.; Antohe, A.; Garg, R.; Wang, Y.; Murray, T.; Wuest, A.; Goodwin, F.; Huh, S.; Cordes, A.; Naulleau, P.; Goldberg, K. A.; Mochi, I.; Gullikson, E.; Denbeaux, G.

    2010-03-12

    The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

  14. EUV: induced ablation and surface modifications of solids

    Science.gov (United States)

    Bartnik, A.; Fiedorowicz, H.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Szczurek, A.; Wachulak, P.

    2011-06-01

    In this work results of investigations concerning ablation and surface modification of polymers and some other solids using a laser-plasma EUV source are presented. The plasma radiation was produced using a gas puff target and was focused with a gold-plated grazing incidence ellipsoidal collector. The ablation process was investigated using a scanning electron microscope (SEM) and a quadrupole mass spectrometer (QMS). The chemical changes were investigated by X-ray photoelectron spectroscopy (XPS). Different kinds of micro- and nanostructures created in nearsurface layers of the materials were obtained. Forms of the structures depend on a particular material and the EUV exposure. In case of some polymers even a single shot was sufficient for creation of the visible changes in surface morphology. In case of inorganic solids visible changes required usually the exposure with tens or hundreds of EUV pulses. XPS investigations revealed chemical changes in near surface layers of polymers. Significant differences were revealed in the XPS spectra acquired for irradiated and not-irradiated polymers. Significant decrease of functional groups containing oxygen was indicated. Analysis of QMS spectra indicate emission of different kinds of fragments of the polymer chains including the repeating structural units. In case of some polymers only fragments of the repeating unit were detected.

  15. EUV nanosecond laser ablation of silicon carbide, tungsten and molybdenum

    Science.gov (United States)

    Frolov, Oleksandr; Kolacek, Karel; Schmidt, Jiri; Straus, Jaroslav; Choukourov, Andrei; Kasuya, Koichi

    2015-09-01

    In this paper we present results of study interaction of nanosecond EUV laser pulses at wavelength of 46.9 nm with silicon carbide (SiC), tungsten (W) and molybdenum (Mo). As a source of laser radiation was used discharge-plasma driver CAPEX (CAPillary EXperiment) based on high current capillary discharge in argon. The laser beam is focused with a spherical Si/Sc multilayer-coated mirror on samples. Experimental study has been performed with 1, 5, 10, 20 and 50 laser pulses ablation of SiC, W and Mo at various fluence values. Firstly, sample surface modification in the nanosecond time scale have been registered by optical microscope. And the secondly, laser beam footprints on the samples have been analyzed by atomic-force microscope (AFM). This work supported by the Czech Science Foundation under Contract GA14-29772S and by the Grant Agency of the Ministry of Education, Youth and Sports of the Czech Republic under Contract LG13029.

  16. Solar Spectral Proxy Irradiance from GOES (SSPRING): a model for solar EUV irradiance

    Science.gov (United States)

    Suess, Katherine; Snow, Martin; Viereck, Rodney; Machol, Janet

    2016-02-01

    Several currently operating instruments are able to measure the full EUV spectrum at sufficient wavelength resolution for use in upper-atmosphere modeling, the effects of space weather, and modeling satellite drag. However, no missions are planned at present to succeed the Thermosphere Ionosphere Mesosphere Energetics and Dynamics (TIMED) and Solar Dynamics Observatory (SDO) missions, which currently provide these data sources. To develop a suitable replacement for these measurements, we use two broadband EUV channels on the NOAA GOES satellites, the magnesium core-to-wing ratio (Mg II index) from the SOlar Radiation and Climate Experiment (SORCE) as well as EUV and Mg II time averages to model the EUV spectrum from 0.1 to 105 nm at 5-nm spectral resolution and daily time resolution. A Levenberg-Marquardt least squares fitting algorithm is used to determine a coefficient matrix that best reproduces a reference data set when multiplied by input data. The coefficient matrix is then applied to model data outside of the fitting interval. Three different fitting intervals are tested, with a variable fitting interval utilizing all days of data before the prediction date producing the best results. The correlation between the model results and the observed spectrum is found to be above 95% for the 0.1-50 nm range, and between 74% and 95% for the 50-105 nm range. We also find a favorable comparison between our results and the Flare Irradiance Spectral Model (FISM). These results provide a promising potential source for an empirical EUV spectral model after direct EUV measurements are no longer available, and utilize a similar EUV modeling technique as the upcoming GOES-R satellites.

  17. Solar Spectral Proxy Irradiance from GOES (SSPRING: a model for solar EUV irradiance

    Directory of Open Access Journals (Sweden)

    Suess Katherine

    2016-01-01

    Full Text Available Several currently operating instruments are able to measure the full EUV spectrum at sufficient wavelength resolution for use in upper-atmosphere modeling, the effects of space weather, and modeling satellite drag. However, no missions are planned at present to succeed the Thermosphere Ionosphere Mesosphere Energetics and Dynamics (TIMED and Solar Dynamics Observatory (SDO missions, which currently provide these data sources. To develop a suitable replacement for these measurements, we use two broadband EUV channels on the NOAA GOES satellites, the magnesium core-to-wing ratio (Mg II index from the SOlar Radiation and Climate Experiment (SORCE as well as EUV and Mg II time averages to model the EUV spectrum from 0.1 to 105 nm at 5-nm spectral resolution and daily time resolution. A Levenberg-Marquardt least squares fitting algorithm is used to determine a coefficient matrix that best reproduces a reference data set when multiplied by input data. The coefficient matrix is then applied to model data outside of the fitting interval. Three different fitting intervals are tested, with a variable fitting interval utilizing all days of data before the prediction date producing the best results. The correlation between the model results and the observed spectrum is found to be above 95% for the 0.1–50 nm range, and between 74% and 95% for the 50–105 nm range. We also find a favorable comparison between our results and the Flare Irradiance Spectral Model (FISM. These results provide a promising potential source for an empirical EUV spectral model after direct EUV measurements are no longer available, and utilize a similar EUV modeling technique as the upcoming GOES-R satellites.

  18. Nanoplasmonic generation of ultrashort EUV pulses

    Science.gov (United States)

    Choi, Joonhee; Lee, Dong-Hyub; Han, Seunghwoi; Park, In-Yong; Kim, Seungchul; Kim, Seung-Woo

    2012-10-01

    Ultrashort extreme-ultraviolet (EUV) light pulses are an important tool for time-resolved pump-probe spectroscopy to investigate the ultrafast dynamics of electrons in atoms and molecules. Among several methods available to generate ultrashort EUV light pulses, the nonlinear frequency upconversion process of high-harmonic generation (HHG) draws attention as it is capable of producing coherent EUV pulses with precise control of burst timing with respect to the driving near-infrared (NIR) femtosecond laser. In this report, we present and discuss our recent experimental data obtained by the plasmon-driven HHG method that generate EUV radiation by means of plasmonic nano-focusing of NIR femtosecond pulses. For experiment, metallic waveguides having a tapered hole of funnel shape inside were fabricated by adopting the focused-ion-beam process on a micro-cantilever substrate. The plasmonic field formed within the funnelwaveguides being coupled with the incident femtosecond pulse permitted intensity enhancement by a factor of ~350, which creates a hot spot of sub-wavelength size with intensities strong enough for HHG. Experimental results showed that with injection of noble gases into the funnel-waveguides, EUV radiation is generated up to wavelengths of 32 nm and 29.6 nm from Ar and Ne gas atoms, respectively. Further, it was observed that lower-order EUV harmonics are cut off in the HHG spectra by the tiny exit aperture of the funnel-waveguide.

  19. EUV-mirror, optical system with EUV-mirror and associated operating method

    NARCIS (Netherlands)

    Dinger, U.; Bijkerk, Frederik; Bayraktar, Muharrem; Dier, O.

    2016-01-01

    An EUV mirror (1000) has a mirror element which forms a mirror surface of the mirror. The mirror element has a substrate (1020) and a multilayer arrangement (1030) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV). The

  20. Novel EUV mask black border and its impact on wafer imaging

    Science.gov (United States)

    Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Watanabe, Genta; Ito, Shin; Yoshida, Itaru; Maruyama, Shingo; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

    2016-03-01

    EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The EUV mask is a key element in the lithographic scanner optical path. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the EUV light reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. To reduce this effect an etched multilayer type black border was developed, and it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light which is emitted from EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel black border called Hybrid Black Border has been developed which allows to eliminate EUV and DUV OOB light reflection. Direct measurements of OOB light from HBB and Normal BB are performed on NXE:3300B ASML EUV scanner; it is shown that HBB OOB reflection is 3x lower than that of Normal BB. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

  1. Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas

    Science.gov (United States)

    Makimura, Tetsuya; Torii, Shuichi; Nakamura, Daisuke; Takahashi, Akihiko; Okada, Tatsuo; Niino, Hiroyuki; Murakami, Kouichi

    2013-05-01

    We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10{300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer an be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.

  2. TESIS experiment on EUV imaging spectroscopy of the Sun

    Science.gov (United States)

    Kuzin, S. V.; Bogachev, S. A.; Zhitnik, I. A.; Pertsov, A. A.; Ignatiev, A. P.; Mitrofanov, A. M.; Slemzin, V. A.; Shestov, S. V.; Sukhodrev, N. K.; Bugaenko, O. I.

    2009-03-01

    TESIS is a set of solar imaging instruments in development by the Lebedev Physical Institute of the Russian Academy of Science, to be launched aboard the Russian spacecraft CORONAS-PHOTON in December 2008. The main goal of TESIS is to provide complex observations of solar active phenomena from the transition region to the inner and outer solar corona with high spatial, spectral and temporal resolution in the EUV and Soft X-ray spectral bands. TESIS includes five unique space instruments: the MgXII Imaging Spectroheliometer (MISH) with spherical bent crystal mirror, for observations of the Sun in the monochromatic MgXII 8.42 Å line; the EUV Spectoheliometer (EUSH) with grazing incidence difraction grating, for the registration of the full solar disc in monochromatic lines of the spectral band 280-330 Å; two Full-disk EUV Telescopes (FET) with multilayer mirrors covering the band 130-136 and 290-320 Å; and the Solar EUV Coronagraph (SEC), based on the Ritchey-Chretien scheme, to observe the inner and outer solar corona from 0.2 to 4 solar radii in spectral band 290-320 Å. TESIS experiment will start at the rising phase of the 24th cycle of solar activity. With the advanced capabilities of its instruments, TESIS will help better understand the physics of solar flares and high-energy phenomena and provide new data on parameters of solar plasma in the temperature range 10-10K. This paper gives a brief description of the experiment, its equipment, and its scientific objectives.

  3. EUV photoresist performance results from the VNL and the EUV LLC

    Science.gov (United States)

    Cobb, Jonathan L.; Dentinger, Paul M.; Hunter, Luke L.; O'Connell, Donna J.; Gallatin, Gregg M.; Hinsberg, William D.; Houle, Frances A.; Sanchez, Martha I.; Domke, Wolf-Dieter; Wurm, Stefan; Okoroanyanwu, Uzodinma; Lee, Sang Hun

    2002-07-01

    If EUV lithography is to be inserted at the 65-nm node of the 2001 International Technology Roadmap for Semiconductors, beta-tool resists must be ready in 2004. These resists should print 35-65 nm lines on a 130-nm pitch with LER below 4 nm 3s. For throughput considerations, the sizing dose should be below 4 mJ/cm2. The VNL and EUV LLC resist development program has measured the resolution, LER, and sizing dose of approximately 60 ESCAP photoresists with the 10X exposure tools at Sandia National Laboratories. The NA of these tools is 0.088, and every resist measured would support the beta-tool resolution requirement if the resolution scales with NA as predicted by optics. 50-nm dense lines have been printed with monopole off-axis illumination, but 35-nm resolution on a 130-nm pitch remains to be demonstrated. Only one photoresist met the LER specification, but its sizing dose of 22 mJ/cm2 is over five times too large. The power spectral density of the roughness of every resist has a Lorentzian line shape, and most of the roughness comes from frequencies within the resolution of the exposure tools. This suggests a strong contribution from mask and optics, but more work needs to be done to determine the source of the roughness. Many resists have sizing doses below the 4 mJ/cm2 target, and neither resolution nor LER degrades with decreasing sizing dose, suggesting that shot noise is not yet affecting the results. The best overall resist resolved 80-nm dense lines with 5.3 nm 3s LER on 100-nm dense lines at a sizing dose of 3.2 mJ/cm2. Thus, it comes close to, but does not quite meet, the beta-tool resist targets.

  4. Preparations for EUV interferometry of the 0.3 NA MET optic

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Naulleau, Patrick P.; Denham, Paul E.; Rekawa, Senajith B.; Jackson, Keith H.; Liddle, J. Alexander; Harteneck, Bruce; Gullikson, Eric; Anderson, Erik H.

    2003-10-30

    An at-wavelength interferometer is being created for the measurement and alignment of the 0.3 numerical aperture Micro Exposure Tool projection optic at EUV wavelengths. The prototype MET system promises to provide early learning from EUV lithographic imaging down to 20-nm feature size. The threefold increase to 0.3 NA in the image-side numerical aperture presents several challenges for the extension of ultra-high-accuracy interferometry, including pinhole fabrication and the calibration and removal of systematic error sources.

  5. Fundamentals of EUV resist-inorganic hardmask interactions

    Science.gov (United States)

    Goldfarb, Dario L.; Glodde, Martin; De Silva, Anuja; Sheshadri, Indira; Felix, Nelson M.; Lionti, Krystelle; Magbitang, Teddie

    2017-03-01

    High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardmasks (HMs) as etch transfer layers for EUV patterning. Ultrathin (lessons learned in this work can be directly applied to the engineering of EUV resist materials and processes specifically designed to work on such novel HMs.

  6. EUV repair process optimization and integration

    Science.gov (United States)

    Nesládek, Pavel; Lajn, Alexander; Schedel, Thorsten; Bender, Markus

    2017-07-01

    EUV technology is according to current trend approaching the final development phase in which defect free EUV masks are of key importance for development and optimization of the lithography process. This task consists of three contributing aspects- defect free multilayer blank, mask manufacturing process with very low defect formation probability and availability of repair process for EUV mask. In comparison to optical mask, development of the repair process for EUV mask is different in several aspects. The fact, that the TaN absorber is placed on top of Mo/Si mirror is making the process very sensitive to variation of the mask material, as the etch rate of the mirror is significantly higher, than that of absorber, when no capping layer is present between the absorber and ML mirror. The presence of the Ru capping layer increases the process window due to significant selectivity improvement by one or two orders of magnitude, however, the capping layer is very sensitive to damage by preceding manufacturing processes. Its thickness and also it chemical purity - lack of modification by incorporation of impurities is crucial for successful mask repair. The repair process for optical masks is typically optimized using AIMS for both development and qualification of the process. The availability of EUV AIMS system is very limited, for what reason we have to rely on other measures during the process development and use the AIMS for process qualification only, or use correlation between e.g. CD SEM or AFM measurement and AIMS data for selection and qualification of the repair process. Also the usage of mask - exposure on the scanner is modifying the mask surface. Therefore the impact of the mask exposure needs to be investigated, when EUV gets in HVM stage. In the past, the influence of the mask cleaning process on the integrity of EUV mask was investigated, with respect to several lithography-critical parameters as actinic reflectivity, critical dimension (CD) shift, edge

  7. Static and dynamic photoresist shrinkage effects in EUV photoresists

    Science.gov (United States)

    Bunday, Benjamin; Montgomery, Cecilia; Montgomery, Warren; Cordes, Aaron

    2012-03-01

    Photoresist shrinkage (a.k.a. line slimming) is an important systematic uncertainty source in critical dimension-scanning electron microscope (CD-SEM) metrology of lithographic features [1][2][3][4][5]. In terms of metrology gauge metrics, it influences both the precision and the accuracy of CD-SEM measurements, while locally damaging the sample. Minimization or elimination of shrinkage is desirable, yet elusive. This error source will furthermore be a factor in CDSEM metrology on such polymer materials into the era of EUV lithography, such that learning to work around this issue will continue to be necessary. Recent work has demonstrated improved understanding of the trends in the shrinkage response depending on electron beam and target parameters in the static measurement case [2][3][4][5][6]. Another recent work has highlighted a second mode of shrinkage that is apparent over time and progresses as a function of time between consecutive measurements, a form of "dynamic shrinkage" that appears to be activated by electron beam, in which the activated feature perpetually and logarithmically shrinks [7][8]. In this work, we will explore both the static and dynamic shrinkage behaviors of various EUV photoresists. The static shrinkage behaviors will be tested for compliance with the SEMATECH shrinkage model [5][6], and further studies will confirm whether or not the dynamic effects are observable. Knowledge of secondary trends in dynamic shrinkage will also be further explored, including how these vary with electron beam energy, activation dose, feature size, and other parameters.

  8. Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation

    Science.gov (United States)

    Kim, In-Seon; Kim, Guk-Jin; Yeung, Michael; Barouch, Eytan; Oh, Hye-Keun

    2017-03-01

    EUV lithography is one of the promising technologies for 1X nm patterning. EUV lithography has high resolution capability because of short wavelength of source but it has some particular patterning problems which are not appeared a t optical lithography. Owing to reflective optics, EUV light incidents obliquely in mask and oblique incidence of EUV lithography leads shadow effect and arc-shaped exposure slit. The study of these particular optical problems are required for optical proximity correction (OPC). Arc-shaped exposure slit leads azimuthal angle variation, incident angle variation , and variation of shadow width. With these variations along exposure slit, patterning result is varied along the exposure slit. With understanding of these particular optical problems, lots of EUV OPC studies have been presented with 0.33 conventional NA system. However, suggested anamorphic high NA system has not only elliptical shaped mask NA and also different angle distribution. The incident angle variation as a function of azimuthal angle is different between isomorphic and anamorphic NA systems. In case of anamorphic NA system, incident angle distribution is decreased on horizontal direction but it is larger on vertical direction compared with case of isomorphic NA system. These differences make different arc-shaped slit effect. CD variation as a function of azimuthal angle is different between isomorphic and a namorphic NA systems. The study of CD variation along the exposure slit is very helpful for OPC in EUV lithography.

  9. Oxidation and metal contamination of EUV optics

    NARCIS (Netherlands)

    Sturm, Jacobus Marinus; Liu, Feng; Pachecka, Malgorzata; Lee, Christopher James; Bijkerk, Frederik

    2013-01-01

    The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding

  10. Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask

    Science.gov (United States)

    Sherwin, Stuart; Pistor, Thomas V.; Neureuther, Andrew; Naulleau, Patrick

    2017-03-01

    Contact-hole layer patterning is expected to be one of the first applications for EUV lithography. Conventional absorber masks, however, are extremely inefficient for these layers, placing even more burden on the already challenging source power demands. To address this concern, a chromeless checker-board phase-shift mask for 25- nm dense contacts has been shown to provide a throughput gain of 8x based on characterization with the SHARP EUV microscope and 7x based on micro field patterning with the Berkeley MET. These promising experimental results warrant both assessment for implementation in practice and rigorous simulations for diagnosing 3D mask effects. In this paper we verify the theoretical benefits of phase-shift masks over traditional absorber masks in idealized Kirchhoff analysis, explore the sensitivity of patterning to deviations from the ideal scattered orders, model the etched multilayer using thin-film characteristic matrix analysis, and finally use rigorous 3D Finite-Time Time Domain (FTTD) simulations of etched multilayer masks to explore mitigation of 3D effects to achieve optimal mask designs for minimum-pitch line-space and contact array patterns.

  11. EUV microexposures at the ALS using the 0.3-NA MET projectionoptics

    Energy Technology Data Exchange (ETDEWEB)

    Naulleau, Patrick; Goldberg, Kenneth A.; Anderson, Erik; Cain,Jason P.; Denham, Paul; Hoef, Brian; Jackson, Keith; Morlens,Anne-Sophie; Rekawa, Seno; Dean, Kim

    2005-09-01

    The recent development of high numerical aperture (NA) EUV optics such as the 0.3-NA Micro Exposure Tool (MET) optic has given rise to a new class of ultra-high resolution microexposure stations. Once such printing station has been developed and implemented at Lawrence Berkeley National Laboratory's Advanced Light Source. This flexible printing station utilizes a programmable coherence illuminator providing real-time pupil-fill control for advanced EUV resist and mask development. The Berkeley exposure system programmable illuminator enables several unique capabilities. Using dipole illumination out to {sigma}=1, the Berkeley tool supports equal-line-space printing down to 12 nm, well beyond the capabilities of similar tools. Using small-sigma illumination combined with the central obscuration of the MET optic enables the system to print feature sizes that are twice as small as those coded on the mask. In this configuration, the effective 10x-demagnification for equal lines and spaces reduces the mask fabrication burden for ultra-high-resolution printing. The illuminator facilitates coherence studies such as the impact of coherence on line-edge roughness (LER) and flare. Finally the illuminator enables novel print-based aberration monitoring techniques as described elsewhere in these proceedings. Here we describe the capabilities of the new MET printing station and present system characterization results. Moreover, we present the latest printing results obtained in experimental resists. Limited by the availability of high-resolution photoresists, equal line-space printing down to 25 nm has been demonstrated as well as isolated line printing down to 29 nm with an LER of approaching 3 nm.

  12. Coefficient of thermal expansion (CTE) in EUV lithography: LER and adhesion improvement

    Science.gov (United States)

    Higgins, Craig; Settens, Charles; Wolfe, Patricia; Petrillo, Karen; Auger, Robert; Matyi, Richard; Brainard, Robert

    2011-04-01

    Spin-on underlayers are currently being employed by the lithographic industry to improve the imaging performance of EUV resists. In this work, multiple examples have shown improved line-edge roughness (LER) of an open-source resist using new open-source underlayers in comparison to a primed silicon substrate. Additionally, several experiments demonstrate better resist adhesion on underlayers that have lower coefficients of thermal expansion (CTE). Both organic and inorganic underlayers provide better resist LER when their CTE is lower.

  13. Cross-Calibration of the GOES-R SUVI with On-Orbit Solar EUV Instruments

    Science.gov (United States)

    Darnel, Jonathan; Seaton, Daniel B.

    2016-05-01

    Maintaining the calibration of on-orbit instruments has always been a challenge, but one which is crucial for the accuracy of the data record. This challenge is magnified for solar Extreme UltraViolet (EUV) instruments. Absolute calibration is out of the question as stable and known sources of EUV irradiance are not practical in on-orbit environments. This leaves relative calibration against other solar EUV instruments whose calibration has been well tracked. The need for such cross-calibration efforts is especially acute for an instrument like the Solar Ultraviolet Imager (SUVI), which will fly on the GOES-R spacecraft later this year and is expected to provide two decades of solar observation between four identical instruments. Not only must calibration between the four instruments in the SUVI line be maintained, but the relative calibration between SUVI and both present day imagers like SDO/AIA and PROBA2/SWAP and future instruments yet to be developed must be established as well. We present the methodology developed using current on-orbit solar EUV instruments in order to maintain the calibration of the SUVI instruments.

  14. Thorough characterization of an EUV mask

    Science.gov (United States)

    Mizuno, Hiroyuki; McIntyre, Gregory; Koay, Chiew-seng; Burkhardt, Martin; He, Long; Hartley, John; Johnson, Corbet; Raghunathan, Sudharshanan; Goldberg, Kenneth; Mochi, Iacopo; La Fontaine, Bruno; Wood, Obert

    2009-04-01

    We reported that we were successful in our 45nm technology node device demonstration in February 2008 and 22nm node technology node device patterning in February 2009 using ASML's Alpha Demo Tool (ADT).1, 2, 3 In order to insert extreme ultraviolet (EUV) lithography at the 15nm technology node and beyond, we have thoroughly characterized one EUV mask, a so-called NOVACD mask. In this paper, we report on three topics. The first topic is an analysis of line edge roughness (LER) using a mask Scanning Electron Microscope (SEM), an Atomic Force Microscope (AFM) and the Actinic Inspection Tool (AIT) to compare resist images printed with the ASML ADT. The results of the analysis show a good correlation between the mask AFM and the mask SEM measurements. However, the resist printing results for the isolated space patterns are slightly different. The cause of this discrepancy may be resist blur, image log slope and SEM image quality and so on. The second topic is an analysis of mask topography using an AFM and relative reflectivity of mirror and absorber surface using the AIT. The AFM data show 6 and 7 angstrom rms roughness for mirror and absorber, respectively. The reflectivity measurements show that the mirror reflects EUV light about 20 times higher than absorber. The last topic is an analysis of a 32nm technology node SRAM cell which includes a comparison of mask SEM image, AIT image, resist image and simulation results. The ADT images of the SRAM pattern were of high quality even though the mask patters were not corrected for OPC or any EUV-specific effects. Image simulation results were in good agreement with the printing results.

  15. Studies of Solar EUV Irradiance from SOHO

    Science.gov (United States)

    Floyd, Linton

    2002-01-01

    The Extreme Ultraviolet (EUV) irradiance central and first order channel time series (COC and FOC) from the Solar EUV Monitor aboard the Solar and Heliospheric observatory (SOHO) issued in early 2002 covering the time period 1/1/96-31/1201 were analyzed in terms of other solar measurements and indices. A significant solar proton effect in the first order irradiance was found and characterized. When this effect is removed, the two irradiance time series are almost perfectly correlated. Earlier studies have shown good correlation between the FOC and the Hall core-to-wing ratio and likewise, it was the strongest component of the COC. Analysis of the FOC showed dependence on the F10.7 radio flux. Analysis of the CDC signals showed additional dependences on F10.7 and the GOES x-ray fluxes. The SEM FOC was also well correlated with thein 30.4 nm channel of the SOHO EUV Imaging Telescope (EIT). The irradiance derived from all four EIT channels (30.4 nm, 17.1 nm, 28.4 nm, and 19.5 nm) showed better correlation with MgII than F10.7.

  16. EUV Doppler Imaging for CubeSat Platforms Project

    Data.gov (United States)

    National Aeronautics and Space Administration — Mature the design and fabricate the Flare Initiation Doppler Imager (FIDI) instrument to demonstrate low-spacecraft-resource EUV technology (most notably,...

  17. Novel EUV mask black border suppressing EUV and DUV OoB light reflection

    Science.gov (United States)

    Ito, Shin; Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Maruyama, Shingo; Watanabe, Genta; Yoshida, Itaru; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

    2016-05-01

    EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. This is related to the fact that EUV absorber stack reflects 1-3% of actinic EUV light. To reduce this effect several types of image border with reduced EUV reflectance (HBB) has been developed to eliminate EUV and DUV OOB light reflection by applying optical design technique and special micro-fabrication technique. A new test mask with HBB is fabricated without any degradation of mask quality according to the result of CD performance in the main pattern, defectivity and cleaning durability. The imaging performance for N10 imaging structures is demonstrated on NXE:3300B in collaboration with ASML. This result is compared to the imaging results obtained for a mask with the earlier developed BB, and HBB has achieved ~3x improvement; less than 0.2 nm CD changes are observed in the corners of the die. A CD uniformity budget including impact of OOB light in the die edge area is evaluated which shows that the OOB impact from HBB becomes comparable with other CDU contributors in this area. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

  18. Progress in resolution, sensitivity, and critical dimensional uniformity of EUV chemically amplified resists

    Science.gov (United States)

    Thackeray, James; Cameron, James; Jain, Vipul; LaBeaume, Paul; Coley, Suzanne; Ongayi, Owendi; Wagner, Mike; Rachford, Aaron; Biafore, John

    2013-03-01

    This paper will discuss further progress obtained at Dow for the improvement of the Resolution, Contact critical dimension uniformity(CDU), and Sensitivity of EUV chemically amplified resists. For resolution, we have employed the use of polymer-bound photoacid generator (PBP) concept to reduce the intrinsic acid diffusion that limits the ultimate resolving capability of CA resists. For CDU, we have focused on intrinsic dissolution contrast and have found that the photo-decomposable base (PDB) concept can be successfully employed. With the use of a PDB, we can reduce CDU variation at a lower exposure energy. For sensitivity, we have focused on more efficient EUV photon capture through increased EUV absorption, as well as more highly efficient PAGs for greater acid generating efficiency. The formulation concepts will be confirmed using Prolith stochastic resist modeling. For the 26nm hp contact holes, we get excellent overall process window with over 280nm depth of focus for a 10% exposure latitude Process window. The 1sigma Critical dimension uniformity [CDU] is 1.1 nm. We also obtain 20nm hp contact resolution in one of our new EUV resists.

  19. SoFAST: Automated Flare Detection with the PROBA2/SWAP EUV Imager

    Science.gov (United States)

    Bonte, K.; Berghmans, D.; De Groof, A.; Steed, K.; Poedts, S.

    2013-08-01

    The Sun Watcher with Active Pixels and Image Processing (SWAP) EUV imager onboard PROBA2 provides a non-stop stream of coronal extreme-ultraviolet (EUV) images at a cadence of typically 130 seconds. These images show the solar drivers of space-weather, such as flares and erupting filaments. We have developed a software tool that automatically processes the images and localises and identifies flares. On one hand, the output of this software tool is intended as a service to the Space Weather Segment of ESA's Space Situational Awareness (SSA) program. On the other hand, we consider the PROBA2/SWAP images as a model for the data from the Extreme Ultraviolet Imager (EUI) instrument prepared for the future Solar Orbiter mission, where onboard intelligence is required for prioritising data within the challenging telemetry quota. In this article we present the concept of the software, the first statistics on its effectiveness and the online display in real time of its results. Our results indicate that it is not only possible to detect EUV flares automatically in an acquired dataset, but that quantifying a range of EUV dynamics is also possible. The method is based on thresholding of macropixelled image sequences. The robustness and simplicity of the algorithm is a clear advantage for future onboard use.

  20. ROSAT EUV and soft X-ray studies of atmospheric composition and structure in G191-B2B

    Science.gov (United States)

    Barstow, M. A.; Fleming, T. A.; Finley, D. S.; Koester, D.; Diamond, C. J.

    1993-01-01

    Previous studies of the hot DA white dwarf GI91-B2B have been unable to determine whether the observed soft X-ray and EUV opacity arises from a stratified hydrogen and helium atmosphere or from the presence of trace metals in the photosphere. New EUV and soft X-ray photometry of this star, made with the ROSAT observatory, when analyzed in conjunction with the earlier data, shows that the stratified models cannot account for the observed fluxes. Consequently, we conclude that trace metals must be a substantial source of opacity in the photosphere of G191-B2B.

  1. Innovative CEA Information Server: Helping K--12 Teachers and Students Navigate the EUVE Mission Archive

    Science.gov (United States)

    Kronberg, F.; Hawkins, I.; Levandovsky, N.; Wong, L.; Arellano, V.; Ford, P.; Nguyen, K.; Malina, R. F.

    1995-12-01

    Internet access to the Extreme Ultraviolet Explorer (EUVE) mission archive for participants in the Science Online and Science Information Infrastructure programs will be facilitated by an innovative, World Wide Web--based data server being developed at the UC Berkeley Center for EUV Astrophysics (CEA). The Innovative CEA Information Server, being developed for the Science Education Program, will allow the user to easily select and access material from the EUVE mission archive. The entire archive, as part of an overarching CEA project, the EUVE Knowledge Base, will be logically structured into knowledge units. Each knowledge unit is defined as ``all of the information available at CEA about a given subject encapsulated into a self-contained, single, multimedia object.'' The user will be able to specify parameters that indicate the desired levels of complexity, breadth or scope, and format (e.g., text or graphics) of the requested knowledge units. The K--12 education materials for this Server are being developed at CEA via a ``Partners in Science'' teacher internship program funded by Research Corporation. Dr. Nelli Levandovsky, a physics teacher from San Francisco Unified School District's Galileo high school, created the following two tutorial plans this past summer: ``Be an Engineer---Learn How to Operate a Satellite'' and ``Be a Scientist---Learn How to Become a Space Researcher.'' Current development efforts are concentrated in two areas: (1) reviewing types of EUVE archival data and mission information and how these knowledge units can be packaged and presented; and (2) investigating how issues of breadth (e.g., scope or extent) and depth (e.g., complexity) of the knowledge units can be better presented in the construction of the Server. This work is supported by NASA contract NAS5-29298.

  2. MAVEN EUV Modelled Data Bundle

    Data.gov (United States)

    National Aeronautics and Space Administration — This bundle contains solar irradiance spectra in 1-nm bins from 0-190 nm. The spectra are generated based upon the Flare Irradiance Spectra Model - Mars (FISM-M)...

  3. Soft x-ray imaging with incoherent sources

    Science.gov (United States)

    Wachulak, P.; Torrisi, A.; Ayele, M.; Bartnik, A.; Czwartos, J.; Wegrzyński, Ł.; Fok, T.; Parkman, T.; Vondrová, Š.; Turnová, J.; Odstrcil, M.; Fiedorowicz, H.

    2017-05-01

    In this work we present experimental, compact desk-top SXR microscope, the EUV microscope which is at this stage a technology demonstrator, and finally, the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources, employing a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths, respectively, are capable of imaging nanostructures with a sub-50 nm spatial resolution with relatively short (seconds) exposure times. The SXR contact microscope operates in the "water-window" spectral range, to produce an imprint of the internal structure of the sample in a thin layer of SXR light sensitive photoresist. Applications of such desk-top EUV and SXR microscopes for studies of variety of different samples - test objects for resolution assessment and other objects such as carbon membranes, DNA plasmid samples, organic and inorganic thin layers, diatoms, algae and carcinoma cells, are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.

  4. Reflective optics for effective collection of x-ray and EUV radiation: use for creation of photoionized plasmas and detection of weak signals

    Science.gov (United States)

    Bartnik, A.; Skrzeczanowski, W.; Wachulak, P.; Saber, I.; Fiedorowicz, H.; Fok, T.; Wegrzyński, Ł.

    2017-05-01

    In this work different kinds of reflective optical systems were used for creation and investigation of low temperature, photoionized plasmas. The plasmas were created in gases, irradiated with a focused beam of extreme ultraviolet (EUV) or soft X-ray (SXR) radiation, from laser-plasma sources employing 10 Hz Nd:YAG laser systems (0.8 J/ 4 ns and 10 J/ 1-10 ns). In both cases, the EUV radiation was focused using a gold-plated grazing incidence ellipsoidal collector in the wavelength range λ = 9÷70 nm or a gold-plated grazing incidence multifoil collector in the wavelength range λ = 5 ÷ 70 nm. Additionally, in case of the 10 J Nd:YAG laser with the pulse duration 1 ns, a paraboloidal collector optimized for the wavelength range λ >= 1 nm was employed. Different gases were injected into the vacuum chamber, perpendicularly to an optical axis of the irradiation system at the focal region, using an auxillary gas puff valve. Irradiation of the gases resulted in ionization and excitation of atoms/molecules. Spectra in SXR/EUV range were measured using a grazing incidence, flat-field spectrometer (McPherson Model 251), equipped with a 450 lines/mm toroidal grating or a home-made spectrograph based on the 5000 l/mm transmission grating. Optical spectra were recorded using the Echelle Spectra Analyzer ESA 4000. In all cases the most intense emission lines were assigned to singly charged ions, however, lines corresponding to ions with higher charge were also recorded. Based on spectral lines originating from ions electron temperature was estimated.

  5. Photoresist shrinkage effects in 16 nm node extreme ultraviolet (EUV) photoresist targets

    Science.gov (United States)

    Bunday, Benjamin; Montgomery, Cecilia; Montgomery, Warren; Cepler, Aron

    2013-04-01

    Photoresist shrinkage (i.e., line slimming) is an important systematic uncertainty source in critical dimension-scanning electron microscope (CD-SEM) metrology of lithographic features [1] [2] [3] [4] [5]. It influences both the precision and the accuracy of CD-SEM measurements, while locally damaging the sample. Minimization or elimination of shrinkage is desirable, yet elusive. This error source will be a factor in CD-SEM metrology on polymer materials in EUV lithography. Recent work has demonstrated improved understanding of the trends in the shrinkage response depending on electron beam and target parameters in static measurements [2] [3] [4] [5] [6]. Some research has highlighted a second mode of shrinkage that is apparent over time and progresses as a function of time between consecutive measurements, a form of "dynamic shrinkage" that appears to be activated by electron beam, in which the activated feature perpetually and logarithmically shrinks [7] [8]. Another work has demonstrated that as pitches continue to get smaller with resulting reductions in spaces between lines, charging may emerge as an additional, competing, unpredictable error source for CD-SEM metrology on dense photoresist features, an issue that is predicted to become more common as these spaces become more confined [9]. In this work, we explore the static shrinkage behaviors of various EUV photoresists into the 16 nm half-pitch node, with samples generated using the advanced EUV lithography capable of generating such tight pitches [10]. Dynamic shrinkage behavior was explored on these materials last year [15]. The static shrinkage behaviors will be validated to show compliance with the SEMATECH shrinkage model [5] [6] on small EUV resist features. Using the results of the model fits, a simulation study will predict the shrinkage trends at future nodes. Further studies will confirm whether or not charging phenomena are observable, and the beginning of a charging simulation study will be

  6. EUV mask manufacturing readiness in the merchant mask industry

    Science.gov (United States)

    Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

    2017-10-01

    As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for

  7. RZLINE code modelling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation

    NARCIS (Netherlands)

    Koshelev, K.; Noivkov, V.G.; Medvedev, Viacheslav; Grushin, A.S.; Krivtsun, V.M.

    2012-01-01

    Abstract. An integrated model is developed to describe the hydrodynamics, atomic, and radiation processes that take place in extreme ultraviolet (EUV) radiation sources based on a laser-produced plasma with a distributed tin target. The modeling was performed using the RZLINE code—a numerical code

  8. Embedded top-coat for reducing the effect out of band radiation in EUV lithography

    Science.gov (United States)

    Du, Ke; Siauw, Meiliana; Valade, David; Jasieniak, Marek; Voelcker, Nico; Trefonas, Peter; Thackeray, Jim; Blakey, Idriss; Whittaker, Andrew

    2017-03-01

    Out of band (OOB) radiation from the EUV source has significant implications for the performance of EUVL photoresists. Here we introduce a surface-active polymer additive, capable of partitioning to the top of the resist film during casting and annealing, to protect the underlying photoresist from OOB radiation. Copolymers were prepared using reversible addition-fragmentation chain transfer (RAFT) polymerization, and rendered surface active by chain extension with a block of fluoro-monomer. Films were prepared from the EUV resist with added surface-active Embedded Barrier Layer (EBL), and characterized using measurements of contact angles and spectroscopic ellipsometry. Finally, the lithographic performance of the resist containing the EBL was evaluated using Electron Beam Lithography exposure

  9. Impact of EUV SRAF on Bossung tilt

    Science.gov (United States)

    Wang, Yow-Gwo; Hsu, Stephen; Socha, Robert; Neureuther, Andy; Naulleau, Patrick

    2017-03-01

    Mask 3D (M3D) effects remain a significant challenge affecting EUV lithography (EUVL) imaging performance due to the comparable sizes of the mask and the EUV wavelength. Pre-compensation with the insertion of sub-resolution assist features (SRAFs) has been proposed as a solution to compensate M3D effects and improve the process window for advanced technology nodes. In this paper, we discuss the possible positive impact of SRAFs on Bossung tilt, and provide physical insight into the optical mechanisms at play enabling M3D effect mitigation. In particular, we consider an example isolated 2-bar (CD = 16 nm) pattern imaged under delta function dipole illumination. We compare the scattered order distribution and Bossung tilt with and without SRAFs. The results show that SRAFs actually introduce stronger effective single pole aberrations in the imaging process. However, the opposite impacts on Bossung tilt from each pole results in an overall improvement for dipole illumination. Reduced Bossung tilt and a 21% improvement of the overlapping process window are achieved by the insertion of asymmetric SRAFs into the 2-bar mask design.

  10. Electron beam inspection of 16nm HP node EUV masks

    Science.gov (United States)

    Shimomura, Takeya; Narukawa, Shogo; Abe, Tsukasa; Takikawa, Tadahiko; Hayashi, Naoya; Wang, Fei; Ma, Long; Lin, Chia-Wen; Zhao, Yan; Kuan, Chiyan; Jau, Jack

    2012-11-01

    EUV lithography (EUVL) is the most promising solution for 16nm HP node semiconductor device manufacturing and beyond. The fabrication of defect free EUV mask is one of the most challenging roadblocks to insert EUVL into high volume manufacturing (HVM). To fabricate and assure the defect free EUV masks, electron beam inspection (EBI) tool will be likely the necessary tool since optical mask inspection systems using 193nm and 199nm light are reaching a practical resolution limit around 16nm HP node EUV mask. For production use of EBI, several challenges and potential issues are expected. Firstly, required defect detection sensitivity is quite high. According to ITRS roadmap updated in 2011, the smallest defect size needed to detect is about 18nm for 15nm NAND Flash HP node EUV mask. Secondly, small pixel size is likely required to obtain the high sensitivity. Thus, it might damage Ru capped Mo/Si multilayer due to accumulated high density electron beam bombardments. It also has potential of elevation of nuisance defects and reduction of throughput. These challenges must be solved before inserting EBI system into EUV mask HVM line. In this paper, we share our initial inspection results for 16nm HP node EUV mask (64nm HP absorber pattern on the EUV mask) using an EBI system eXplore® 5400 developed by Hermes Microvision, Inc. (HMI). In particularly, defect detection sensitivity, inspectability and damage to EUV mask were assessed. As conclusions, we found that the EBI system has capability to capture 16nm defects on 64nm absorber pattern EUV mask, satisfying the sensitivity requirement of 15nm NAND Flash HP node EUV mask. Furthermore, we confirmed there is no significant damage to susceptible Ru capped Mo/Si multilayer. We also identified that low throughput and high nuisance defect rate are critical challenges needed to address for the 16nm HP node EUV mask inspection. The high nuisance defect rate could be generated by poor LWR and stitching errors during EB writing

  11. Study of the early phase of a Coronal Mass Ejection driven shock in EUV images

    Science.gov (United States)

    Frassati, Federica; Susino, Roberto; Mancuso, Salvatore; Bemporad, Alessandro

    2017-10-01

    The November 1st, 2014 prominence eruption (associated with a C2.7 class flare) resulted in a fast, partial-halo Coronal Mass Ejection (CME). During its early propagation, the CME produced a type II radio burst (seen by the Bruny Island Radio Spectrometer) starting around 04:57 UT when the front entered into the LASCO/C2 field of view (FOV) and the top of the CME front was at the heliocentric distance of about 2.5 R_{⊙}. In order to identify the source of the type II radio burst, we studied the kinematic of the eruption with EUV images acquired by SDO/AIA. Profiles of the observed EUV front speed have been compared with the Alfvén speed profiles derived by combining the plasma electron densities obtained from Emission Measure analysis and model magnetic fields extrapolated on the plane of the sky. Our results show that the northern half of the front became super-Alfvénic at approximately the same time when the type-II radio burst started. A comparison between the starting frequency of the type II emission and the frequencies corresponding to the coronal densities of the locations where the EUV front became super-Alfvénic suggests that the radio sources should be located in the northern flank of the front.

  12. Positron source based on neutron capture

    Science.gov (United States)

    Hugenschmidt, C.; Kögel, G.; Repper, R.; Schreckenbach, K.; Sperr, P.; Triftshäuser, W.

    2003-10-01

    A positron beam based on absorption of high-energy prompt γ-rays from thermal neutron capture in 113Cd was installed at a neutron guide of the High Flux Reactor at the ILL in Grenoble. The positron source consists of platinum foils acting as γ-e +e --converter and positron moderator. After acceleration to 3 keV by electrical lenses the positrons were magnetically guided through the beamline. Measurements were performed for various source geometries. The beam diameter and moderation characteristics such as positron work function, moderation efficiency and degradation were determined as well. The results lead to an optimised design of the in-pile positron source which will be implemented at the Munich research reactor FRM-II.

  13. Cyclotron-based neutron source for BNCT

    Science.gov (United States)

    Mitsumoto, T.; Yajima, S.; Tsutsui, H.; Ogasawara, T.; Fujita, K.; Tanaka, H.; Sakurai, Y.; Maruhashi, A.

    2013-04-01

    Kyoto University Research Reactor Institute (KURRI) and Sumitomo Heavy Industries, Ltd. (SHI) have developed a cyclotron-based neutron source for Boron Neutron Capture Therapy (BNCT). It was installed at KURRI in Osaka prefecture. The neutron source consists of a proton cyclotron named HM-30, a beam transport system and an irradiation & treatment system. In the cyclotron, H- ions are accelerated and extracted as 30 MeV proton beams of 1 mA. The proton beams is transported to the neutron production target made by a beryllium plate. Emitted neutrons are moderated by lead, iron, aluminum and calcium fluoride. The aperture diameter of neutron collimator is in the range from 100 mm to 250 mm. The peak neutron flux in the water phantom is 1.8×109 neutrons/cm2/sec at 20 mm from the surface at 1 mA proton beam. The neutron source have been stably operated for 3 years with 30 kW proton beam. Various pre-clinical tests including animal tests have been done by using the cyclotron-based neutron source with 10B-p-Borono-phenylalanine. Clinical trials of malignant brain tumors will be started in this year.

  14. Cyclotron-based neutron source for BNCT

    Energy Technology Data Exchange (ETDEWEB)

    Mitsumoto, T.; Yajima, S.; Tsutsui, H.; Ogasawara, T.; Fujita, K. [Sumitomo Heavy Industries, Ltd (Japan); Tanaka, H.; Sakurai, Y.; Maruhashi, A. [Kyoto University Research Reactor Institute (Japan)

    2013-04-19

    Kyoto University Research Reactor Institute (KURRI) and Sumitomo Heavy Industries, Ltd. (SHI) have developed a cyclotron-based neutron source for Boron Neutron Capture Therapy (BNCT). It was installed at KURRI in Osaka prefecture. The neutron source consists of a proton cyclotron named HM-30, a beam transport system and an irradiation and treatment system. In the cyclotron, H- ions are accelerated and extracted as 30 MeV proton beams of 1 mA. The proton beams is transported to the neutron production target made by a beryllium plate. Emitted neutrons are moderated by lead, iron, aluminum and calcium fluoride. The aperture diameter of neutron collimator is in the range from 100 mm to 250 mm. The peak neutron flux in the water phantom is 1.8 Multiplication-Sign 109 neutrons/cm{sup 2}/sec at 20 mm from the surface at 1 mA proton beam. The neutron source have been stably operated for 3 years with 30 kW proton beam. Various pre-clinical tests including animal tests have been done by using the cyclotron-based neutron source with {sup 10}B-p-Borono-phenylalanine. Clinical trials of malignant brain tumors will be started in this year.

  15. The Effects of Oxygen Plasma on the Chemical Composition and Morphology of the Ru Capping Layer of the Extreme Ultraviolet (EUV) Mask Blanks

    Energy Technology Data Exchange (ETDEWEB)

    Belau, Leonid; Park, Jeong Y.; Liang, Ted; Somorjai, Gabor A.

    2008-06-07

    Contamination removal from extreme ultraviolet (EUV) mask surfaces is one of the most important aspects to improve reliability for the next generation of EUV lithography. We report chemical and morphological changes of the ruthenium (Ru) mask surface after oxygen plasma treatment using surface sensitive analytical methods: X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and transmission electron microscopy (TEM). Chemical analysis of the EUV masks shows an increase in the subsurface oxygen concentration, Ru oxidation and surface roughness. XPS spectra at various photoelectron takeoff angles suggest that the EUV mask surface was covered with chemisorbed oxygen after oxygen plasma treatment. It is proposed that the Kirkendall effect is the most plausible mechanism that explains the Ru surface oxidation. The etching rate of the Ru capping layer by oxygen plasma was estimated to be 1.5 {+-} 0.2 {angstrom}/min, based on TEM cross sectional analysis.

  16. Open Source GIS based integrated watershed management

    Science.gov (United States)

    Byrne, J. M.; Lindsay, J.; Berg, A. A.

    2013-12-01

    Optimal land and water management to address future and current resource stresses and allocation challenges requires the development of state-of-the-art geomatics and hydrological modelling tools. Future hydrological modelling tools should be of high resolution, process based with real-time capability to assess changing resource issues critical to short, medium and long-term enviromental management. The objective here is to merge two renowned, well published resource modeling programs to create an source toolbox for integrated land and water management applications. This work will facilitate a much increased efficiency in land and water resource security, management and planning. Following an 'open-source' philosophy, the tools will be computer platform independent with source code freely available, maximizing knowledge transfer and the global value of the proposed research. The envisioned set of water resource management tools will be housed within 'Whitebox Geospatial Analysis Tools'. Whitebox, is an open-source geographical information system (GIS) developed by Dr. John Lindsay at the University of Guelph. The emphasis of the Whitebox project has been to develop a user-friendly interface for advanced spatial analysis in environmental applications. The plugin architecture of the software is ideal for the tight-integration of spatially distributed models and spatial analysis algorithms such as those contained within the GENESYS suite. Open-source development extends knowledge and technology transfer to a broad range of end-users and builds Canadian capability to address complex resource management problems with better tools and expertise for managers in Canada and around the world. GENESYS (Generate Earth Systems Science input) is an innovative, efficient, high-resolution hydro- and agro-meteorological model for complex terrain watersheds developed under the direction of Dr. James Byrne. GENESYS is an outstanding research and applications tool to address

  17. Mrk421: EUVE observations from 1994 to 1997

    OpenAIRE

    Cagnoni, Ilaria; Fruscione, Antonella; Papadakis, Iossif E.

    1998-01-01

    We present spectral and timing analysis of all the data collected by the Extreme Ultraviolet Explorer for the BL Lac object Mrk 421 from 1994 to 1997. During these years Mrk 421 has been observed by EUVE 4 times with the DS/Spectrograph and 2 times with the imaging telescopes for a total of ~1.4 millions seconds. The total EUVE light curve seems to be smoothly varying on the long time-scale while on a shorter time-scale there is evidence of an EUVE flare correlated to the 1995 TeV flare. We a...

  18. Development of a novel closed EUV pellicle for EUVL manufacturing

    Science.gov (United States)

    Ono, Yosuke; Kohmura, Kazuo; Okubo, Atsushi; Taneichi, Daiki; Ishikawa, Hisako; Biyajima, Tsuneaki

    2016-09-01

    As for the EUV pellicle, closed pellicle structure with the filters which has fundamentally no penetration path of particles is needed to keep the clean reliability level of photomask equivalent to the current photolithography. We proposed a novel closed EUV pellicle equipped with filters which has not only the particle intrusion prevention but also the ventilation performance. Full-size closed EUV pellicle was fabricated by forming the vent holes in the Si border part and putting the wide filters on the top side of Si border. As the result, we experimentally confirmed the suppression of the membrane deflection under the practical pumping down condition.

  19. Measuring Modularity in Open Source Code Bases

    Directory of Open Access Journals (Sweden)

    Roberto Milev

    2009-03-01

    Full Text Available Modularity of an open source software code base has been associated with growth of the software development community, the incentives for voluntary code contribution, and a reduction in the number of users who take code without contributing back to the community. As a theoretical construct, modularity links OSS to other domains of research, including organization theory, the economics of industry structure, and new product development. However, measuring the modularity of an OSS design has proven difficult, especially for large and complex systems. In this article, we describe some preliminary results of recent research at Carleton University that examines the evolving modularity of large-scale software systems. We describe a measurement method and a new modularity metric for comparing code bases of different size, introduce an open source toolkit that implements this method and metric, and provide an analysis of the evolution of the Apache Tomcat application server as an illustrative example of the insights gained from this approach. Although these results are preliminary, they open the door to further cross-discipline research that quantitatively links the concerns of business managers, entrepreneurs, policy-makers, and open source software developers.

  20. 4-D modeling of CME expansion and EUV dimming observed with STEREO/EUVI

    Directory of Open Access Journals (Sweden)

    M. J. Aschwanden

    2009-08-01

    Full Text Available This is the first attempt to model the kinematics of a CME launch and the resulting EUV dimming quantitatively with a self-consistent model. Our 4-D-model assumes self-similar expansion of a spherical CME geometry that consists of a CME front with density compression and a cavity with density rarefaction, satisfying mass conservation of the total CME and swept-up corona. The model contains 14 free parameters and is fitted to the 25 March 2008 CME event observed with STEREO/A and B. Our model is able to reproduce the observed CME expansion and related EUV dimming during the initial phase from 18:30 UT to 19:00 UT. The CME kinematics can be characterized by a constant acceleration (i.e., a constant magnetic driving force. While the observations of EUVI/A are consistent with a spherical bubble geometry, we detect significant asymmetries and density inhomogeneities with EUVI/B. This new forward-modeling method demonstrates how the observed EUV dimming can be used to model physical parameters of the CME source region, the CME geometry, and CME kinematics.

  1. Characterization of highly transient EUV emitting discharges

    Energy Technology Data Exchange (ETDEWEB)

    Mullen, Joost van der; Kieft, Erik; Broks, Bart [Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven (Netherlands)

    2006-07-15

    The method of disturbed Bilateral Relations (dBR) is used to characterize highly transient plasmas that are used for the generation of Extreme Ultra Violet (EUV), i.e. radiation with a wavelength around 13.5 nm. This dBR method relates equilibrium disturbing to equilibrium restoring processes and follows the degree of equilibrium departure from the global down to the elementary plasma-level. The study gives global values of the electron density and electron temperature. Moreover, it gives a method to construct the atomic state distribution function (ASDF). This ASDF, which is responsible for the spectrum generated by the discharge, is found to be far from equilibrium. There are two reasons for this: first, systems with high charge numbers radiate strongly, second the highly transient behaviour makes that the distribution over the various ionization stages lags behind the temperature evolution.

  2. Critical challenges for EUV resist materials

    Energy Technology Data Exchange (ETDEWEB)

    Naulleau, Patrick P.; Anderson, Christopher N.; Baclea-an, Lorie-Mae; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Jones, Gideon; McClinton, Brittany; Miyakawa, Ryan; Rekawa, Seno; Smith, Nathan

    2011-02-28

    Although Extreme ultraviolet lithography (EUVL) is now well into the commercialization phase, critical challenges remain in the development of EUV resist materials. The major issue for the 22-nm half-pitch node remains simultaneously meeting resolution, line-edge roughness (LER), and sensitivity requirements. Although several materials have met the resolution requirements, LER and sensitivity remain a challenge. As we move beyond the 22-nm node, however, even resolution remains a significant challenge. Chemically amplified resists have yet to demonstrate the required resolution at any speed or LER for 16-nm half pitch and below. Going to non-chemically amplified resists, however, 16-nm resolution has been achieved with a LER of 2 nm but a sensitivity of only 70 mJ/cm{sup 2}.

  3. Heating Mechanisms for Intermittent Loops in Active Region Cores from AIA/SDO EUV Observations

    Science.gov (United States)

    Cadavid, A. C.; Lawrence, J. K.; Christian, D. J.; Jess, D. B.; Nigro, G.

    2014-11-01

    We investigate intensity variations and energy deposition in five coronal loops in active region cores. These were selected for their strong variability in the AIA/SDO 94 Å intensity channel. We isolate the hot Fe XVIII and Fe XXI components of the 94 Å and 131 Å by modeling and subtracting the "warm" contributions to the emission. HMI/SDO data allow us to focus on "inter-moss" regions in the loops. The detailed evolution of the inter-moss intensity time series reveals loops that are impulsively heated in a mode compatible with a nanoflare storm, with a spike in the hot 131 Å signals leading and the other five EUV emission channels following in progressive cooling order. A sharp increase in electron temperature tends to follow closely after the hot 131 Å signal confirming the impulsive nature of the process. A cooler process of growing emission measure follows more slowly. The Fourier power spectra of the hot 131 Å signals, when averaged over the five loops, present three scaling regimes with break frequencies near 0.1 min-1 and 0.7 min-1. The low frequency regime corresponds to 1/f noise; the intermediate indicates a persistent scaling process and the high frequencies show white noise. Very similar results are found for the energy dissipation in a 2D "hybrid" shell model of loop magneto-turbulence, based on reduced magnetohydrodynamics, that is compatible with nanoflare statistics. We suggest that such turbulent dissipation is the energy source for our loops.

  4. A new storage-ring light source

    Energy Technology Data Exchange (ETDEWEB)

    Chao, Alex [SLAC National Accelerator Lab., Menlo Park, CA (United States)

    2015-06-01

    A recently proposed technique in storage ring accelerators is applied to provide potential high-power sources of photon radiation. The technique is based on the steady-state microbunching (SSMB) mechanism. As examples of this application, one may consider a high-power DUV photon source for research in atomic and molecular physics or a high-power EUV radiation source for industrial lithography. A less challenging proof-of-principle test to produce IR radiation using an existing storage ring is also considered.

  5. Modeling and optimization of mass-limited targets for EUV lithography

    Science.gov (United States)

    Sizyuk, T.; Hassanein, A.

    2012-03-01

    Current challenges in the development of efficient laser produced plasma (LPP) sources for EUV lithography are increasing EUV power at IF and maximizing lifetime and therefore, reducing cost of devices. Mass-limited targets such as small tin droplets are considered among the best choices for cleaner operation of the optical system because of lower mass of atomic debris produced by the laser beam. The small diameter of droplets, however, decreases the conversion efficiency (CE) of EUV photons emission, especially in the case of CO2 laser, where laser wavelength has high reflectivity from the tin surface. We investigated ways of improving CE in mass-limited targets. We considered in our modeling various possible target phases and lasers configurations: from solid/liquid droplets subjected to laser beam energy with different intensities and laser wavelength to dual-beam lasers, i.e., a pre-pulse followed by a main pulse with adjusted delay time in between. We studied the dependence of vapor expansion rate, which can be produced as a result of droplet heating by pre-pulse laser energy, on target configuration, size, and laser beam parameters. As consequence, we studied the influence of these conditions and parameters on the CE and debris mass accumulation. For better understanding and more accurate modeling of all physical processes occurred during various phases of laser beam/target interactions, plasma plume formation and evolution, EUV photons emission and collection, we have implemented in our HEIGHTS package state-of-the art models and methods, verified, and benchmarked against laboratory experiments in our CMUXE center as well as various worldwide experimental results.

  6. The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials.

    Science.gov (United States)

    Closser, Kristina D; Ogletree, D Frank; Naulleau, Patrick; Prendergast, David

    2017-04-28

    In order to increase computation power and efficiency, the semiconductor industry continually strives to reduce the size of features written using lithographic techniques. The planned switch to a shorter wavelength extreme ultraviolet (EUV) source presents a challenge for the associated photoresists, which in their current manifestation show much poorer photoabsorption cross sections for the same dose. Here we consider the critical role that an inner-shell electronic structure might play in enhancing photoabsorption cross sections, which one can control by the choice of substituent elements in the photoresist. In order to increase the EUV sensitivity of current photoresists, it is critical to consider the inner-shell atomic structure of the elements that compose the materials. We validate this hypothesis using a series of halogenated organic molecules, which all have similar valence structures, but differ in the character of their semi-core and deep valence levels. Using various implementations of time-dependent density functional theory, the absorption cross sections are computed for the model systems of CH3X, X = H, OH, F, Cl, Br, I, as well as a representative polymer fragment: 2-methyl-phenol and its halogenated analogues. Iodine has a particularly high cross section in the EUV range, which is due to delayed absorption by its 4d electrons. The computational results are compared to standard database values and experimental data when available. Generally we find that the states that dominate the EUV oscillator strength are generated by excitations of deep valence or semi-core electrons, which are primarily atomic-like and relatively insensitive to the specific molecular structure.

  7. Gadolinium EUV Multilayers for Solar Imaging Near 60 nm Project

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose to develop and commercialize a new class of extreme ultraviolet (EUV) multilayer coatings containing the rare-earth element gadolinium (Gd), designed as...

  8. Optical and EUV light curves of dwarf nova outbursts

    Energy Technology Data Exchange (ETDEWEB)

    Mauche, C W; Mattei, J A; Bateson, F M

    2000-11-15

    We combine AAVSO and VSS/RASNZ optical and Extreme Ultraviolet Explorer EUV light curves of dwarf novae in outburst to place constraints on the nature of dwarf nova outbursts. From the observed optical-EUV time delays of {approx} 0.75-1.5 days, we show that the propagation velocity of the dwarf nova instability heating wave is {approx} 3 km s{sup -1}.

  9. EUV stimulated emission from MgO pumped by FEL pulses

    Directory of Open Access Journals (Sweden)

    Philippe Jonnard

    2017-09-01

    Full Text Available Stimulated emission is a fundamental process in nature that deserves to be investigated and understood in the extreme ultra-violet (EUV and x-ray regimes. Today, this is definitely possible through high energy density free electron laser (FEL beams. In this context, we give evidence for soft-x-ray stimulated emission from a magnesium oxide solid target pumped by EUV FEL pulses formed in the regime of travelling-wave amplified spontaneous emission in backward geometry. Our results combine two effects separately reported in previous works: emission in a privileged direction and existence of a material-dependent threshold for the stimulated emission. We develop a novel theoretical framework, based on coupled rate and transport equations taking into account the solid-density plasma state of the target. Our model accounts for both observed mechanisms that are the privileged direction for the stimulated emission of the Mg L2,3 characteristic emission and the pumping threshold.

  10. EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

    Science.gov (United States)

    Attwood, David

    2004-12-01

    The International Technology Roadmap for Semiconductors (ITRS) [1] provides industry expectations for high volume computer chip fabrication a decade into the future. It provides expectations to anticipated performance and requisite specifications. While the roadmap provides a collective projection of what international industry expects to produce, it does not specify the technology that will be employed. Indeed, there are generally several competing technologies for each two or three year step forward—known as `nodes'. Recent successful technologies have been based on KrF (248 nm), and now ArF (193 nm) lasers, combined with ultraviolet transmissive refractive optics, in what are known as step and scan exposure tools. Less fortunate technologies in the recent past have included soft x-ray proximity printing and, it appears, 157 nm wavelength F2 lasers. In combination with higher numerical aperture liquid emersion optics, 193 nm is expected to be used for the manufacture of leading edge chip performance for the coming five years. Beyond that, starting in about 2009, the technology to be employed is less clear. The leading candidate for the 2009 node is extreme ultraviolet (EUV) lithography, however this requires that several remaining challenges, including sufficient EUV source power, be overcome in a timely manner. This technology is based on multilayer coated reflective optics [2] and an EUV emitting plasma. Following Moore's Law [3] it is expected, for example, that at the 2009 `32 nm node' (printable patterns of 32 nm half-pitch), isolated lines with 18 nm width will be formed in resist (using threshold effects), and that these will be further narrowed to 13 nm in transfer to metalized electronic gates. These narrow features are expected to provide computer chips of 19 GHz clock frequency, with of the order of 1.5 billion transistors per chip [1]. This issue of Journal of Physics D: Applied Physics contains a cluster of eight papers addressing the critical

  11. Source Code Generator Based on Dynamic Frames

    Directory of Open Access Journals (Sweden)

    Danijel Radošević

    2011-06-01

    Full Text Available Normal 0 21 false false false HR X-NONE X-NONE MicrosoftInternetExplorer4 /* Style Definitions */ table.MsoNormalTable {mso-style-name:"Obična tablica"; mso-tstyle-rowband-size:0; mso-tstyle-colband-size:0; mso-style-noshow:yes; mso-style-priority:99; mso-style-qformat:yes; mso-style-parent:""; mso-padding-alt:0cm 5.4pt 0cm 5.4pt; mso-para-margin:0cm; mso-para-margin-bottom:.0001pt; mso-pagination:widow-orphan; font-size:11.0pt; font-family:"Calibri","sans-serif"; mso-ascii-font-family:Calibri; mso-ascii-theme-font:minor-latin; mso-fareast-font-family:"Times New Roman"; mso-fareast-theme-font:minor-fareast; mso-hansi-font-family:Calibri; mso-hansi-theme-font:minor-latin; mso-bidi-font-family:"Times New Roman"; mso-bidi-theme-font:minor-bidi;} This paper presents the model of source code generator based on dynamic frames. The model is named as the SCT model because if its three basic components: Specification (S, which describes the application characteristics, Configuration (C, which describes the rules for building applications, and Templates (T, which refer to application building blocks. The process of code generation dynamically creates XML frames containing all building elements (S, C ant T until final code is produced. This approach is compared to existing XVCL frames based model for source code generating. The SCT model is described by both XML syntax and the appropriate graphical elements. The SCT model is aimed to build complete applications, not just skeletons. The main advantages of the presented model are its textual and graphic description, a fully configurable generator, and the reduced overhead of the generated source code. The presented SCT model is shown on development of web application example in order to demonstrate its features and justify our design choices.

  12. Monitoring based localisation of pollution sources

    Science.gov (United States)

    Sokac, M.; Velisková, Y.

    2017-10-01

    Water quality modelling is currently very effective and important tool in context of the task to ensure the required quality of water resources, respectively, to achieve (maintain) good water status according the Water Framework Directive (2000/60/EC). This paper analyses the current status in numerical modelling of pollution dispersion in streams and use of some modelling approaches for the inverse task. Inverse task means a modelling technique, which is focused on the localisation of unknown pollution source (typical common models or equations are rather focused on the pollution spreading simulation, whereas the pollution source location is known). Paper offers an idea of such inverse task solution. It is based on the known pollution concentration time courses or it can be based on the results of the on-line monitoring of the specific water quality parameters as well. For the application of inverse tasks in conditions of real streams and rivers a large number of various requirements and conditions in specific river should be considered, i. a. the non-prismatic river bed, occurrence of dead zones, dispersion rate etc. Paper also describes the first version of the software for solving inverse tasks and preliminary experiences of using this software.

  13. Curved focal plane extreme ultraviolet detector array for a EUV camera on CHANG E lander.

    Science.gov (United States)

    Ni, Q; Song, K; Liu, S; He, L; Chen, B; Yu, W

    2015-11-30

    A novel curved focal plane extreme ultraviolet (EUV) detector array designed for a moon-based EUV camera is demonstrated. The curved focal plane detector array operating in a pulse-counting mode consists of a curved microchannel plate (MCP) stack and an induced charge wedge-strip anode (WSA). The curved MCP is fabricated by firstly thermally slumping of the MCPs, and then followed by optical polishing and core glass etching. By using this technology, curved MCPs with a length-to-diameter (L/D) ratio of 80:1 and a radius of curvature of 150 mm have been successfully achieved. The performance of the curved MCP detector is fully characterized in terms of the background noise, pulse height distribution, gain, image linearity and spatial resolution. It is measured that a spatial resolution of 7.13 lp/mm can be achieved with a background noise of less than 0.3 counts/cm2⋅s. The characterization results indicate that the curved focal plane detector can fulfill the requirements of the moon-based EUV camera.

  14. Classification and printability of EUV mask defects from SEM images

    Science.gov (United States)

    Cho, Wonil; Price, Daniel; Morgan, Paul A.; Rost, Daniel; Satake, Masaki; Tolani, Vikram L.

    2017-10-01

    Classification and Printability of EUV Mask Defects from SEM images EUV lithography is starting to show more promise for patterning some critical layers at 5nm technology node and beyond. However, there still are many key technical obstacles to overcome before bringing EUV Lithography into high volume manufacturing (HVM). One of the greatest obstacles is manufacturing defect-free masks. For pattern defect inspections in the mask-shop, cutting-edge 193nm optical inspection tools have been used so far due to lacking any e-beam mask inspection (EBMI) or EUV actinic pattern inspection (API) tools. The main issue with current 193nm inspection tools is the limited resolution for mask dimensions targeted for EUV patterning. The theoretical resolution limit for 193nm mask inspection tools is about 60nm HP on masks, which means that main feature sizes on EUV masks will be well beyond the practical resolution of 193nm inspection tools. Nevertheless, 193nm inspection tools with various illumination conditions that maximize defect sensitivity and/or main-pattern modulation are being explored for initial EUV defect detection. Due to the generally low signal-to-noise in the 193nm inspection imaging at EUV patterning dimensions, these inspections often result in hundreds and thousands of defects which then need to be accurately reviewed and dispositioned. Manually reviewing each defect is difficult due to poor resolution. In addition, the lack of a reliable aerial dispositioning system makes it very challenging to disposition for printability. In this paper, we present the use of SEM images of EUV masks for higher resolution review and disposition of defects. In this approach, most of the defects detected by the 193nm inspection tools are first imaged on a mask SEM tool. These images together with the corresponding post-OPC design clips are provided to KLA-Tencor's Reticle Decision Center (RDC) platform which provides ADC (Automated Defect Classification) and S2A (SEM

  15. Mercury’s EUV Reflectance Spectrum From Mariner 10 Revisited

    Science.gov (United States)

    Vilas, Faith; Hendrix, Amanda R.; Jensen, Elizabeth A.

    2015-11-01

    Carbon, as graphite, has emerged from recent analyses of MESSENGER spectrophotometry and theoretical modeling as a possible source for the darkening component in the Low Reflectance Material (LRM), pervasive across Mercury’s surface. Murchie et al. (Icarus 254, 287, 2015) propose graphite, in amounts consistent with results from MESSENGER’s elemental experiments for the presence of C, as the most likely darkening component in LRM. Vander Kaaden and McCubbin (JGR Planets 120, 195, 2015) report that graphite would be the only buoyant phase in an early magma ocean, and any primary flotation crust would have retained C in the form of graphite. Alternatively, Gillis-Davis et al. (Abstract P1 1A-07, AGU, 2013) suggest that nanophase and microphase iron, produced by impacts into Mercury’s crust before and during the late heavy bombardment, could darken the LRM. Carbon in the forms of graphite and anthracite has distinctive far-UV spectral reflectance features. The MESSENGER MASCS UVVS spectrometer does not extend to wavelengths short enough to observe these features. The Mariner 10 EUV airglow spectrometer observed broad swaths of Mercury in 10 filters at wavelengths ranging from 304Å to 1657Å, each having 20Å passbands. We now re-analyze these data in a search for this distinctive UV signature of graphite across large areas of Mercury’s surface, and will report on the results.

  16. Stellar and Laboratory XUV/EUV Line Ratios in Fe XVIII and Fe XIX

    Science.gov (United States)

    Träbert, Elmar; Beiersdorfer, P.; Clementson, J.

    2011-09-01

    A so-called XUV excess has been suspected with the relative fluxes of Fe XVIII and Fe XIX lines in XUV and EUV spectra of the star Capella as observed by the Chandra spacecraft [1] when comparing the observations with simulations of stellar spectra based on APEC or FAC. We have addressed this problem by laboratory studies using the Livermore electron beam ion trap (EBIT). Our understanding of the EBIT spectrum is founded on work by Brown et al. [2]. The electron density of the electron beam in an EBIT is compatible to the density in energetic stellar flares. In our experiments, the relative detection efficiencies of two flat-field grating spectrographs operating in the EUV (near 100 Å) and XUV (near 16 Å) ranges have been determined using the calculated branching ratio of 1-3 and 2-3 transition in the H-like spectrum O VIII. FAC calculations assuming several electron beam energies and electron densities serve to correct the EBIT observations for the Maxwellian excitation in a natural plasma. In the EUV, the line intensity pattern predicted by FAC agrees reasonably well with the laboratory and Capella observations. In the XUV wavelength range, agreement of laboratory and astrophysical line intensities is patchy. The spectral simulation results from FAC are much closer to stellar and laboratory observation than those obtained by APEC. Instead of claiming an XUV excess, the XUV/EUV line intensities can be explained by a somewhat higher temperature of Capella than the previously assumed T=6 MK. This work was performed under the auspices of the USDoE by LLNL under Contract DE-AC52-07NA27344 and was supported by the NASA under work order NNH07AF81I issued by the APRA Program. E.T. acknowledges support by DFG Germany. 1. P. Desai et al., ApJ 625, L59 (2005). 2. G. V. Brown et al., ApJS 140, 589 (2002).

  17. Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure

    Science.gov (United States)

    Pollentier, Ivan; Vesters, Yannick; Jiang, Jing; Vanelderen, Pieter; de Simone, Danilo

    2017-10-01

    The interaction of 91.6eV EUV photons with photoresist is very different to that of optical lithography at DUV wavelength. The latter is understood quite well and it is known that photons interact with the resist in a molecular way through the photoacid generator (PAG) of the chemically amplified resist (CAR). In EUV however, the high energy photons interact with the matter on atomic scale, resulting in the generation of secondary electrons. It is believed that these secondary electrons in their turn are responsible in chemical modification and lead to switching reactions that enable resist local dissolution. However, details of the interaction are still unclear, e.g. which reaction an electron with a given energy can initiate. In this work we have introduced a method to measure the chemical interaction of the secondary electrons with the EUV resist. The method is based on electron gun exposures of low energy electrons (range 1eV to 80eV) in the photoresist. The chemical interaction is then measured by Residual Gas Analysis (RGA), which can analyze out of the outgassing which and how much reaction products are generated. In this way a `chemical yield' can be quantified as function of electron energy. This method has been successfully applied to understand the interaction of secondary electrons on the traditional CAR materials. The understanding was facilitated by testing different compositions of an advanced EUV CAR, where resp. polymer only, polymer+PAG, and polymer+PAG+quencher are tested with the electron gun. It was found that low energy electrons down to 3-4eV can activate PAG dissociation, which can lead to polymer deprotection. However it was observed too that energy electrons of 12eV and higher can do direct deprotection even in absence of the PAG. In addition, testing suggests that electrons can generate also other chemical changes on the polymer chain that could lead to cross-linking.

  18. Recycling of laser and plasma radiation energy for enhancement of extreme ultraviolet sources for nanolithography

    Science.gov (United States)

    Sizyuk, V.; Sizyuk, T.; Hassanein, A.; Johnson, K.

    2018-01-01

    We have developed comprehensive integrated models for detailed simulation of laser-produced plasma (LPP) and laser/target interaction, with potential recycling of the escaping laser and out-of-band plasma radiation. Recycling, i.e., returning the escaping laser and plasma radiation to the extreme ultraviolet (EUV) generation region using retroreflective mirrors, has the potential of increasing the EUV conversion efficiency (CE) by up to 60% according to our simulations. This would result in significantly reduced power consumption and/or increased EUV output. Based on our recently developed models, our High Energy Interaction with General Heterogeneous Target Systems (HEIGHTS) computer simulation package was upgraded for LPP devices to include various radiation recycling regimes and to estimate the potential CE enhancement. The upgraded HEIGHTS was used to study recycling of both laser and plasma-generated radiation and to predict possible gains in conversion efficiency compared to no-recycling LPP devices when using droplets of tin target. We considered three versions of the LPP system including a single CO2 laser, a single Nd:YAG laser, and a dual-pulse device combining both laser systems. The gains in generating EUV energy were predicted and compared for these systems. Overall, laser and radiation energy recycling showed the potential for significant enhancement in source efficiency of up to 60% for the dual-pulse system. Significantly higher CE gains might be possible with optimization of the pre-pulse and main pulse parameters and source size.

  19. EUV mask blank defect inspection strategies for 32-nm half-pitch and beyond

    Science.gov (United States)

    Wurm, Stefan; Han, Hakseung; Kearney, Patrick; Cho, Wonil; Jeon, Chan-Uk; Gullikson, Eric

    2007-05-01

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into manufacturing. Evidently, the success of the industry's mask blank defect reduction effort will critically depend on the timely availability of defect inspection tools that can find ever smaller defects. The first generation of defect inspection tools enabled SEMATECH's Mask Blank Development Center (MBDC) to reduce mask blank defects to a level sufficient for use in EUV alpha tools. The second tool generation is currently enabling the MBDC to meet EUV pilot line requirements by the end of 2007. However, to meet high volume manufacturing (HVM) mask blank defect requirements for 32 nm half-pitch (hp) patterning, the industry needs a third generation of defect inspection tools. This next EUV inspection tool generation must be able to find defects of tools will also need to support extendibility assessments of low defect deposition technologies and the associated infrastructure towards meeting 22 nm half-pitch defect specifications. While visible light inspection is likely to support defect inspection needs for mask substrates over several technology nodes, the industry must explore other options for mask blanks and patterned masks. Evaluating the use of inexpensive printing tools and wafer-based inspection to search for repeating defects must be part of an overall strategy to address mask blank and patterned mask defect inspection.

  20. Performance assessment of the TDRSS Onboard Navigation System (TONS) experiment on EP/EUVE

    Science.gov (United States)

    Gramling, C. J.; Hart, R. C.; Teles, Jerome; Long, A. C.; Maher, M. J.

    1993-01-01

    The National Aeronautics and Space Administration (NASA) Goddard Space Flight Center (GSFC) is currently developing an operational Tracking and Data Relay Satellite (TDRS) System (TDRSS) Onboard Navigation System (TONS) to provide onboard knowledge of high-accuracy navigation products autonomously to users of TDRSS and its successor, TDRS-2. A TONS experiment has been implemented on the Explorer Platform/Extreme Ultraviolet Explorer (EP/EUVE) spacecraft, launched June 7, 1992, to flight qualify the TONS operational system using TDRSS forward-link communications services. This paper assesses the performance of the TONS flight hardware, an ultrastable oscillator (USO) and Doppler extractor (DE) card in one of the TDRSS user transponders, and the protoype flight software, based on the TONS experiment results. An overview of onboard navigation via TDRSS is also presented for both the EP/EUVE experiment and for future users of TONS. USO and DE short-term and long-term stability performance has been excellent. TONS Flight Software analysis indicates that position accuracies of better than 25 meters root-mean-square are achievable with tracking every one to two orbits, for the EP/EUVE 525-kilometer altitudes, 28.5-degree inclination orbit. The success of the TONS experiment demonstrates the flight readiness of TONS, which is scheduled to provide autonomous navigation for the Earth Observing System (EOS)-AM mission.

  1. All fiber based supercontinuum light source utilized for IR microscopy

    DEFF Research Database (Denmark)

    Dupont, Sune; Petersen, Christian; Thøgersen, Jan

    2012-01-01

    An all fiber based supercontinuum light source is demonstrated for infrared microscopy. The high brightness and spatial coherence of the source facilitate fast high resolution measurements.......An all fiber based supercontinuum light source is demonstrated for infrared microscopy. The high brightness and spatial coherence of the source facilitate fast high resolution measurements....

  2. Combined effects of pre-pulsing and target geometry on efficient EUV production from laser produced plasma experiments and modeling

    Science.gov (United States)

    Hassanein, A.; Sizyuk, T.; Sizyuk, V.; Harilal, S. S.

    2011-04-01

    Laser produced plasmas (LPP) is currently a promising source of an efficient extreme ultraviolet (EUV) photon source production for advanced lithography. Optimum laser pulse parameters with adjusted wavelength, energy, and duration for simple planar or spherical tin target can provide 2-3% conversion efficiency (CE) in laboratory experiments. These values are also in good agreement with modeling results. Additional effects such as targets with complex geometry and tin-doped targets using pre-pulsing of laser beams can significantly increase CE. Recent studies showed that such improvements in LPP system are due to reduction in laser energy losses by decreasing photons transmission (higher harmonic of Nd:YAG laser) or photons reflection (for CO2 laser). Optimization of target heating using pre-pulses or ablating low-density and nanoporous tin oxide can further improve LLP sources by creating more efficient plasma plumes and as a result increasing CE, the most important parameter for EUV sources. The second important challenge in developing LPP devices is to decrease fast ions and target debris to protect the optical collection system and increase its lifetime. We investigated the combined effects of pre-pulsing with various parameters and different target geometries on EUV conversion efficiency and on energetic ions production. The much higher reflectivity of CO2 laser from a tin target leads to two possible ways for system improvement using pre-pulses with shorter laser wavelengths or using more complex targets geometries with special grooves as developed previously by the authors.

  3. Chemical Effect of Dry and Wet Cleaning of the Ru Protective Layer of the Extreme ultraviolet (EUV) Lithography Reflector

    Energy Technology Data Exchange (ETDEWEB)

    Belau, Leonid; Park, Jeong Y.; Liang, Ted; Seo, Hyungtak; Somorjai, Gabor A.

    2009-04-10

    The authors report the chemical influence of cleaning of the Ru capping layer on the extreme ultraviolet (EUV) reflector surface. The cleaning of EUV reflector to remove the contamination particles has two requirements: to prevent corrosion and etching of the reflector surface and to maintain the reflectivity functionality of the reflector after the corrosive cleaning processes. Two main approaches for EUV reflector cleaning, wet chemical treatments [sulfuric acid and hydrogen peroxide mixture (SPM), ozonated water, and ozonated hydrogen peroxide] and dry cleaning (oxygen plasma and UV/ozone treatment), were tested. The changes in surface morphology and roughness were characterized using scanning electron microscopy and atomic force microscopy, while the surface etching and change of oxidation states were probed with x-ray photoelectron spectroscopy. Significant surface oxidation of the Ru capping layer was observed after oxygen plasma and UV/ozone treatment, while the oxidation is unnoticeable after SPM treatment. Based on these surface studies, the authors found that SPM treatment exhibits the minimal corrosive interactions with Ru capping layer. They address the molecular mechanism of corrosive gas and liquid-phase chemical interaction with the surface of Ru capping layer on the EUV reflector.

  4. EUV lithography at the 22nm technology node

    Science.gov (United States)

    Wood, Obert; Koay, Chiew-Seng; Petrillo, Karen; Mizuno, Hiroyuki; Raghunathan, Sudhar; Arnold, John; Horak, Dave; Burkhardt, Martin; McIntyre, Gregory; Deng, Yunfei; La Fontaine, Bruno; Okoroanyanwu, Uzo; Wallow, Tom; Landie, Guillaume; Standaert, Theodorus; Burns, Sean; Waskiewicz, Christopher; Kawasaki, Hirohisa; Chen, James H.-C.; Colburn, Matthew; Haran, Bala; Fan, Susan S.-C.; Yin, Yunpeng; Holfeld, Christian; Techel, Jens; Peters, Jan-Hendrik; Bouten, Sander; Lee, Brian; Pierson, Bill; Kessels, Bart; Routh, Robert; Cummings, Kevin

    2010-04-01

    We are evaluating the readiness of extreme ultraviolet (EUV) lithography for insertion into production at the 15 nm technology node by integrating it into standard semiconductor process flows because we believe that device integration exercises provide the truest test of technology readiness and, at the same time, highlight the remaining critical issues. In this paper, we describe the use of EUV lithography with the 0.25 NA Alpha Demo Tool (ADT) to pattern the contact and first interconnect levels of a large (~24 mm x 32 mm) 22 nm node test chip using EUV masks with state-of-the-art defectivity (~0.3 defects/cm2). We have found that: 1) the quality of EUVL printing at the 22 nm node is considerably higher than the printing produced with 193 nm immersion lithography; 2) printing at the 22 nm node with EUV lithography results in higher yield than double exposure double-etch 193i lithography; and 3) EUV lithography with the 0.25 NA ADT is capable of supporting some early device development work at the 15 nm technology node.

  5. Energy deposition and charging in EUV lithography: Monte Carlo studies

    Science.gov (United States)

    Wiseheart, Liam; Narasimhan, Amrit; Grzeskowiak, Steven; Neisser, Mark; Ocola, Leonidas E.; Denbeaux, Greg; Brainard, Robert L.

    2016-03-01

    EUV photons expose photoresists by complex interactions including photoionization to create primary electrons (~80 eV), and subsequent ionization steps that create secondary electrons (10-60 eV). The mechanisms by which these electrons interact with resist components are key to optimizing the performance of EUV resists and EUV lithography as a whole. As these photoelectrons and secondary electrons are created, they deposit their energy within the resist, creating ionized atoms along the way. Because many photo- and secondary electrons can escape the resist through the surface, resists can become charged. Charging and energy deposition profiles within the resist may play a role in the sensitivity and line-edge roughness of EUV resists. In this paper, we present computational analysis of charging-influenced electron behavior in photoresists using LESiS (Low energy Electron Scattering in Solids), a software developed to understand and model electron-matter interactions. We discuss the implementation of charge and tracking and the model used to influence electron behavior. We also present the potential effects of charging on EUV and electron beam lithography by investigating secondary electron blur in charging and non-charging models.

  6. Next Generation Accelerator-Based Light Sources

    Energy Technology Data Exchange (ETDEWEB)

    Gwyn Williams

    2005-06-26

    We discuss the physics which is driving the evolution of new sources for microscopy and spectroscopy. A new generation of sources, called energy recovery linacs or ERL’s, will be described and reviewed with particular emphasis on the examples of imaging and spectroscopic applications enabled by them.

  7. Stochastic exposure kinetics of EUV photoresists: a simulation study

    Science.gov (United States)

    Mack, Chris A.; Thackeray, James W.; Biafore, John J.; Smith, Mark D.

    2011-04-01

    BACKGROUND: The stochastic nature of extreme ultraviolet (EUV) resist exposure leads to variations in the resulting acid concentration, which leads to line-edge roughness (LER) of the resulting features. METHODS: Using a stochastic resist simulator, we predicted the mean and standard deviation of the acid concentration for an open-frame exposure and fit the results to analytical expressions. RESULTS: The EUV resist exposure mechanism of the PROLTIH Stochastic Resist Simulator is first order, and an analytical expression for the exposure rate constant C allows prediction of the mean acid concentration of an open-frame exposure to about 1% accuracy over a wide range of parameter values. A second analytical expression for the standard deviation of the acid concentration also matched the output of PROLITH to within about 1%. CONCLUSIONS: Predicting the stochastic uncertainty in acid concentration for EUV resists allows optimization of resist processing and formulations, and may form the basis of a comprehensive LER model.

  8. Lithographic performance evaluation of a contaminated EUV mask after cleaning

    Energy Technology Data Exchange (ETDEWEB)

    George, Simi; Naulleau, Patrick; Okoroanyanwu, Uzodinma; Dittmar, Kornelia; Holfeld, Christian; Wuest, Andrea

    2009-11-16

    The effect of surface contamination and subsequent mask surface cleaning on the lithographic performance of a EUV mask is investigated. SEMATECH's Berkeley micro-field exposure tool (MET) printed 40 nm and 50 nm line and space (L/S) patterns are evaluated to compare the performance of a contaminated and cleaned mask to an uncontaminated mask. Since the two EUV masks have distinct absorber architectures, optical imaging models and aerial image calculations were completed to determine any expected differences in performance. Measured and calculated Bossung curves, process windows, and exposure latitudes for the two sets of L/S patterns are compared to determine how the contamination and cleaning impacts the lithographic performance of EUV masks. The observed differences in mask performance are shown to be insignificant, indicating that the cleaning process did not appreciably affect mask performance.

  9. EUV mask reflectivity measurements with micro-scale spatial resolution

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Rekawa, Senajith B.; Kemp, Charles D.; Barty, Anton; Anderson, Erik; Kearney, Patrick; Han, Hakseung

    2008-02-01

    The effort to produce defect-free mask blanks for EUV lithography relies on increasing the detection sensitivity of advanced mask inspection tools, operating at several wavelengths. They describe the unique measurement capabilities of a prototype actinic (EUV) wavelength microscope that is capable of detecting small defects and reflectivity changes that occur on the scale of microns to nanometers. The defects present in EUV masks can appear in many well-known forms: as particles that cause amplitude or phase variations in the reflected field; as surface contamination that reduces reflectivity and contrast; and as damage from inspection and use that reduces the reflectivity of the multilayer coating. This paper presents an overview of several topics where scanning actinic inspection makes a unique contribution to EUVL research. They describe the role of actinic scanning inspection in defect repair studies, observations of laser damage, actinic inspection following scanning electron microscopy, and the detection of both native and programmed defects.

  10. A Web Based Puzzle for Energy Sources

    Directory of Open Access Journals (Sweden)

    Nilgun SECKEN

    2006-07-01

    Full Text Available At present many countries in the world consume too much fossil fuels such as petroleum, natural gas and coal to meet their energy needs. These fossil fuels are not renewable; their sources are limited and reducing gradually. More importantly they have been becoming more expensive day by day and their damage to the environment has been increasing. In spite of it, renewable energy sources are renewed and never run out. In addition there are many benefits of renewable energy. In this study a puzzle is prepared for primary-school students aiming at teaching of energy sources as a supplementary source. In the mean time, the puzzle we prepared reveals the advantages and disadvantages of renewable and fossil energy sources. Here, the student’s aim is to complete the puzzle by answering the questions respectively. .

  11. Collecting EUV mask images through focus by wavelength tuning

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Huh, Sungmin

    2009-02-23

    Using an extreme-ultraviolet (EUV) microscope to produce high-quality images of EUV reticles, we have developed a new wavelength tuning method to acquire through-focus data series with a higher level of stability and repeatability than was previously possible. We utilize the chromatic focal-length dependence of a diffractive Fresnel zoneplate objective lens, and while holding the mask sample mechanically still, we tune the wavelength through a narrow range, in small steps. In this paper, we demonstrate the method and discuss the relative advantages that this data collection technique affords.

  12. Neutron Sources for Standard-Based Testing

    Energy Technology Data Exchange (ETDEWEB)

    Radev, Radoslav [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); McLean, Thomas [Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

    2014-11-10

    The DHS TC Standards and the consensus ANSI Standards use 252Cf as the neutron source for performance testing because its energy spectrum is similar to the 235U and 239Pu fission sources used in nuclear weapons. An emission rate of 20,000 ± 20% neutrons per second is used for testing of the radiological requirements both in the ANSI standards and the TCS. Determination of the accurate neutron emission rate of the test source is important for maintaining consistency and agreement between testing results obtained at different testing facilities. Several characteristics in the manufacture and the decay of the source need to be understood and accounted for in order to make an accurate measurement of the performance of the neutron detection instrument. Additionally, neutron response characteristics of the particular instrument need to be known and taken into account as well as neutron scattering in the testing environment.

  13. Association-rule based information source selection

    OpenAIRE

    Yang, Hui; Zhang, Minjie; Shi, Zhongzhi

    2004-01-01

    The proliferation of information sources available on the Wide World Web has resulted in a need for database selection tools to locate the potential useful information sources with respect to the user's information need. Current database selection tools always treat each database independently, ignoring the implicit, useful associations between distributed databases. To overcome this shortcoming, in this paper, we introduce a data-mining approach to assist the process of database selection by...

  14. Delineation of seismic source zones based on seismicity parameters ...

    Indian Academy of Sciences (India)

    The delineation of seismic source zones plays an important role in the evaluation of seismic hazard. In most of the studies the seismic source delineation is done based on geological features. In the present study, an attempt has been made to delineate seismic source zones in the study area (south India) based on the ...

  15. Extending the path for efficient extreme ultraviolet sources for advanced nanolithography

    Science.gov (United States)

    Sizyuk, Tatyana; Hassanein, Ahmed

    2015-09-01

    Developing efficient light sources for extreme ultraviolet (EUV) lithography is one of the most important problems of high volume manufacturing (HVM) of the next generation computer chips. Critical components of this technology are continued to face challenges in the demanding performance for HVM. Current investigations of EUV and beyond EUV (BEUV) community are focused on the dual-pulse laser produced plasma (LPP) using droplets of mass-limited targets. Two main objectives as well as challenges in the optimization of these light sources are related to enhancement of the conversion efficiency (CE) of the source and increase components lifetime of the collector optical system. These require significant experimental and computer simulation efforts. These requirements call for fine detail analysis of various plasma physics processes involved in laser target interactions and their effects on source optimization. We continued to enhance our comprehensive HEIGHTS simulation package and upgrade our CMUXE laboratories to study and optimize the efficiency of LPP sources. Integrated modeling and experimental research were done to both benchmark simulation results and to make projections and realistic predictions of the development path for powerful EUVL devices for HVM requirements. We continued the detail analysis of dual-pulse laser systems using various laser wavelengths and delay times between the two pulses. We showed that the efficiency of EUV sources can be improved utilizing the higher harmonics of Nd:YAG laser for the prepulse and the first harmonics for the main pulse, while still having lower efficiency than the combination involving CO2 laser in the range of parameters studied in this case. The differences in optimization process as well as in the source characteristics for two combinations of laser wavelengths were analyzed based on details of atomic and hydrodynamics processes during the evolving plasma plumes.

  16. Dawn-dusk difference of periodic oxygen EUV dayglow variations at Venus observed by Hisaki

    Science.gov (United States)

    Masunaga, Kei; Seki, Kanako; Terada, Naoki; Tsuchiya, Fuminori; Kimura, Tomoki; Yoshioka, Kazuo; Murakami, Go; Yamazaki, Atsushi; Tao, Chihiro; Leblanc, François; Yoshikawa, Ichiro

    2017-08-01

    We report a dawn-dusk difference of periodic variations of oxygen EUV dayglow (OII 83.4 nm, OI 130.4 nm and OI 135.6 nm) in the upper atmosphere of Venus observed by the Hisaki spacecraft in 2015. Observations show that the periodic dayglow variations are mainly controlled by the solar EUV flux. Additionally, we observed characteristic ∼1 day and ∼4 day periodicities in the OI 135.6 nm brightness. The ∼1 day periodicity was dominant on the duskside while the ∼4 day periodicity was dominant on the dawnside. Although the driver of the ∼1 day periodicity is still uncertain, we suggest that the ∼4 day periodicity is caused by gravity waves that propagate from the middle atmosphere. The thermospheric subsolar-antisolar flow and the gravity waves dominantly enhance eddy diffusion on the dawnside, and the eddy diffusion coefficient changes every ∼4 days due to large periodic modulations of wind velocity of the super-rotating atmosphere. Since the ∼4 day modulations on the dawnside are not continuously observed, it is possible that there is an intermittent coupling between the thermosphere and middle atmosphere due to variations of wave source altitudes. Moreover, if there are variations of the wind velocity in the mesosphere or lower thermosphere, it is possible that gravity waves occasionally propagate to the thermosphere even on the duskside due to periodic disappearance of the critical level and the ∼4 day periodic O atomic modulations occur. Thus, our observations imply that the ∼4 day periodicity of the EUV dayglow may reflect the dynamics of the middle atmosphere of Venus. We also examined the effects of the solar wind on the dayglow variations by shifting the solar wind measurements from earth to Venus. We did not find clear correlations between them. However, since there are no local measurements of the solar wind at Venus, the effect of the solar wind on the dayglow is still uncertain.

  17. Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

    Energy Technology Data Exchange (ETDEWEB)

    Sizyuk, V.; Hassanein, A.; Morozov, V.; Sizyuk, T.; Mathematics and Computer Science

    2007-01-16

    The HEIGHTS integrated model has been developed as an instrument for simulation and optimization of laser-produced plasma (LPP) sources relevant to extreme ultraviolet (EUV) lithography. The model combines three general parts: hydrodynamics, radiation transport, and heat conduction. The first part employs a total variation diminishing scheme in the Lax-Friedrich formulation (TVD-LF); the second part, a Monte Carlo model; and the third part, implicit schemes with sparse matrix technology. All model parts consider physical processes in three-dimensional geometry. The influence of a generated magnetic field on laser plasma behavior was estimated, and it was found that this effect could be neglected for laser intensities relevant to EUV (up to {approx}10{sup 12} W/cm{sup 2}). All applied schemes were tested on analytical problems separately. Benchmark modeling of the full EUV source problem with a planar tin target showed good correspondence with experimental and theoretical data. Preliminary results are presented for tin droplet- and planar-target LPP devices. The influence of three-dimensional effects on EUV properties of source is discussed.

  18. A Web Based Puzzle for Energy Sources

    OpenAIRE

    Secken, Nilgun

    2006-01-01

    At present many countries in the world consume too much fossil fuels such as petroleum, natural gas and coal to meet their energy needs. These fossil fuels are not renewable; their sources are limited and reducing gradually. More importantly they have been becoming more expensive day by day and their damage to the environment has been increasing. In spite of it, renewable energy sources are renewed and never run out. In addition there are many benefits of renewable energy. In this study a puz...

  19. A Web Based Puzzle for Energy Sources

    Science.gov (United States)

    Secken, Nilgun

    2006-01-01

    At present many countries in the world consume too much fossil fuels such as petroleum, natural gas and coal to meet their energy needs. These fossil fuels are not renewable; their sources are limited and reducing gradually. More importantly they have been becoming more expensive day by day and their damage to the environment has been increasing.…

  20. Photonic Crystal Fiber Based Entangled Photon Sources

    Science.gov (United States)

    2014-03-01

    optical fibers. There are a few experimental approaches to resolve transmission loss by using coherent light sources. In quantum cryptography , weak...network,” New J. Phys. 4, 46 (2002). [4]. C. H. Bennet, F. Bessette, G. Brassard, L. Salvail, and J. Smolin,” Experimental quantum cryptography ,” J...

  1. SDO-EVE multiple EUV grating spectrograph (MEGS) optical design

    Science.gov (United States)

    Crotser, David A.; Woods, Thomas N.; Eparvier, Francis G.; Ucker, Greg; Kohnert, Richard A.; Berthiaume, Gregory D.; Weitz, David M.

    2004-10-01

    The NASA Solar Dynamics Observatory (SDO), scheduled for launch in 2008, incorporates a suite of instruments including the EUV Variability Experiment (EVE). The EVE instrument package contains grating spectrographs used to measure the solar extreme ultraviolet (EUV) irradiance from 0.1 to 105 nm. The Multiple EUV Grating Spectrograph (MEGS) channels use concave reflection gratings to image solar spectra onto CCDs that are operated at -100°C. MEGS provides 0.1nm spectral resolution between 5-105nm every 10 seconds with an absolute accuracy of better than 25% over the SDO 5-year mission. MEGS-A utilizes a unique grazing-incidence, off-Rowland circle (RC) design to minimize angle of incidence at the detector while meeting high resolution requirements. MEGS-B utilizes a double-pass, cross-dispersed double-Rowland circle design. MEGS-P, a Ly-α monitor, will provide a proxy model calibration in the 60-105 nm range. Finally, the Solar Aspect Monitor (SAM) channel will provide continual pointing information for EVE as well as low-resolution X-ray images of the sun. In-flight calibrations for MEGS will be provided by the on-board EUV Spectrophotometer (ESP) in the 0.1-7nm and 17-37nm ranges, as well as from annual under-flight rocket experiments. We present the methodology used to develop the MEGS optical design.

  2. Extreme Ultraviolet (EUV) induced surface chemistry on Ru

    NARCIS (Netherlands)

    Liu, Feng; Sturm, Jacobus Marinus; Osorio, E.; van Kampen, M.; Lee, Christopher James; Bijkerk, Frederik

    2013-01-01

    Extreme UV, i.e. 13.5 nm, photons and photon-induced secondary electrons are the driving forces of mirror degradation in EUV lithography equipment. An understanding of the catalytic role of the mirror surface and the photochemical processes is required for controlling such mirror degradation. We

  3. The EUV Spectrum of Sunspot Plumes Observed by SUMER on ...

    Indian Academy of Sciences (India)

    tribpo

    J. Astrophys. Astr. (2000) 21, .397-401. The EUV Spectrum of Sunspot Plumes Observed by SUMER on. SOHO. W. Curdt,. 1. B. N. Dwivedi. 2. & U. Feldman. 3. 1. Max-Planck-Institut für Aeronomie, D-37191, Katlenburg-Lindau, Germany. 2. Department of Applied Physics, Banaras Hindu University, Varanasi-221005, India.

  4. The Development of a New Model of Solar EUV Irradiance Variability

    Science.gov (United States)

    Warren, Harry; Wagner, William J. (Technical Monitor)

    2002-01-01

    The goal of this research project is the development of a new model of solar EUV (Extreme Ultraviolet) irradiance variability. The model is based on combining differential emission measure distributions derived from spatially and spectrally resolved observations of active regions, coronal holes, and the quiet Sun with full-disk solar images. An initial version of this model was developed with earlier funding from NASA. The new version of the model developed with this research grant will incorporate observations from SoHO as well as updated compilations of atomic data. These improvements will make the model calculations much more accurate.

  5. sources

    Directory of Open Access Journals (Sweden)

    Shu-Yin Chiang

    2002-01-01

    Full Text Available In this paper, we study the simplified models of the ATM (Asynchronous Transfer Mode multiplexer network with Bernoulli random traffic sources. Based on the model, the performance measures are analyzed by the different output service schemes.

  6. EUV high resolution imager on-board solar orbiter: optical design and detector performances

    Science.gov (United States)

    Halain, J. P.; Mazzoli, A.; Rochus, P.; Renotte, E.; Stockman, Y.; Berghmans, D.; BenMoussa, A.; Auchère, F.

    2017-11-01

    The EUV high resolution imager (HRI) channel of the Extreme Ultraviolet Imager (EUI) on-board Solar Orbiter will observe the solar atmospheric layers at 17.4 nm wavelength with a 200 km resolution. The HRI channel is based on a compact two mirrors off-axis design. The spectral selection is obtained by a multilayer coating deposited on the mirrors and by redundant Aluminum filters rejecting the visible and infrared light. The detector is a 2k x 2k array back-thinned silicon CMOS-APS with 10 μm pixel pitch, sensitive in the EUV wavelength range. Due to the instrument compactness and the constraints on the optical design, the channel performance is very sensitive to the manufacturing, alignments and settling errors. A trade-off between two optical layouts was therefore performed to select the final optical design and to improve the mirror mounts. The effect of diffraction by the filter mesh support and by the mirror diffusion has been included in the overall error budget. Manufacturing of mirror and mounts has started and will result in thermo-mechanical validation on the EUI instrument structural and thermal model (STM). Because of the limited channel entrance aperture and consequently the low input flux, the channel performance also relies on the detector EUV sensitivity, readout noise and dynamic range. Based on the characterization of a CMOS-APS back-side detector prototype, showing promising results, the EUI detector has been specified and is under development. These detectors will undergo a qualification program before being tested and integrated on the EUI instrument.

  7. Sourcing Team Behavior in Project-Based MNE's

    DEFF Research Database (Denmark)

    Hansen, Anders Peder Lysholm

    2014-01-01

    This paper presents and discusses a multiple case study of three cross-functional category teams responsible for sourcing critical components within multi-national, project-based enterprises. The study focused on behaviour and management of the sourcing teams and found that the sourcing process a...

  8. Understanding EUV resist mottling leading to better resolution and linewidth roughness

    Science.gov (United States)

    Thackeray, James; Cameron, James; Jain, Vipul; LaBeaume, Paul; Coley, Suzanne; Ongayi, Owendi; Wagner, Mike; Biafore, John; Chun, Jun Sung

    2014-04-01

    We have shown that the dissolution properties can be successfully modified to improve the line/space profile and LWR of a low diffusion EUV CA resist. The surface roughness is a function of hot spots in the nominally unexposed regions of the resist material. We conjecture that the photoacid hot spots are formed due to DC flare present in the optical train of the exposure system. We also have shown that the PAGs can be further improved for out-of-band radiation (OOB) response. The improvement can be as much as 557% for 193nm exposure, and 838% by 248nm exposure. The improved OOB response leads to better contact hole performance. We also shared our continued improvement in resist witness plate performance with the majority of our resists passing for carbon growth, and all samples passing for non-cleanables. There does appear to be a site-to-site bias which we attribute to differences between e-beam and EUV exposure and/or substrate working distance from the source. Lastly, we show outstanding lithographic process window for 24 nm contact arrays on an NXE 3300 stepper as well as 15 nm half pitch lines and spaces on the PSI interferometric tool.

  9. An Open-Source Based ITS Platform

    DEFF Research Database (Denmark)

    Andersen, Ove; Krogh, Benjamin Bjerre; Torp, Kristian

    2013-01-01

    In this paper, a complete platform used to compute travel times from GPS data is described. Two approaches to computing travel time are proposed one based on points and one based on trips. Overall both approaches give reasonable results compared to existing manual estimated travel times. However,...

  10. Measuring Solar Doppler Velocities in the He II 30.38 nm Emission Using the EUV Variability Experiment (EVE)

    Science.gov (United States)

    Chamberlin, Phillip Clyde

    2016-01-01

    The EUV Variability Experiment (EVE) onboard the Solar Dynamics Observatory has provided unprecedented measurements of the solar EUV irradiance at high temporal cadence with good spectral resolution and range since May 2010. The main purpose of EVE was to connect the Sun to the Earth by providing measurements of the EUV irradianceas a driver for space weather and Living With a Star studies, but after launch the instrument has demonstrated the significance of its measurements in contributing to studies looking at the sources of solar variability for pure solar physics purposes. This paper expands upon previous findings that EVE can in fact measure wavelength shifts during solar eruptive events and therefore provide Doppler velocities for plasma at all temperatures throughout the solar atmosphere from the chromosphere to hot flaring temperatures. This process is not straightforward as EVE was not designed or optimized for these types of measurements. In this paper we describe the many detailed instrumental characterizations needed to eliminate the optical effects in order to provide an absolute baseline for the Doppler shift studies. An example is given of a solar eruption on 7 September 2011 (SOL2011-09-07), associated with an X1.2 flare, where EVE Doppler analysis shows plasma ejected from the Sun in the He II 30.38 nm emission at a velocity of almost 120 km s(exp -1) along the line-of-sight.

  11. The Foggy EUV Corona and Coronal Heating by MHD Waves from Explosive Reconnection Events

    Science.gov (United States)

    Moore, Ron L.; Cirtain, Jonathan W.; Falconer, David A.

    2008-01-01

    In 0.5 arcsec/pixel TRACE coronal EUV images, the corona rooted in active regions that are at the limb and are not flaring is seen to consist of (1) a complex array of discrete loops and plumes embedded in (2) a diffuse ambient component that shows no fine structure and gradually fades with height. For each of two not-flaring active regions, found that the diffuse component is (1) approximately isothermal and hydrostatic and (2) emits well over half of the total EUV luminosity of the active-region corona. Here, from a TRACE Fe XII coronal image of another not-flaring active region, the large sunspot active region AR 10652 when it was at the west limb on 30 July 2004, we separate the diffuse component from the discrete loop component by spatial filtering, and find that the diffuse component has about 60% of the total luminosity. If under much higher spatial resolution than that of TRACE (e. g., the 0.1 arcsec/pixel resolution of the Hi-C sounding-rocket experiment proposed by J. W. Cirtain et al), most of the diffuse component remains diffuse rather being resolved into very narrow loops and plumes, this will raise the possibility that the EUV corona in active regions consists of two basically different but comparably luminous components: one being the set of discrete bright loops and plumes and the other being a truly diffuse component filling the space between the discrete loops and plumes. This dichotomy would imply that there are two different but comparably powerful coronal heating mechanisms operating in active regions, one for the distinct loops and plumes and another for the diffuse component. We present a scenario in which (1) each discrete bright loop or plume is a flux tube that was recently reconnected in a burst of reconnection, and (2) the diffuse component is heated by MHD waves that are generated by these reconnection events and by other fine-scale explosive reconnection events, most of which occur in and below the base of the corona where they are

  12. Hiding the Source Based on Limited Flooding for Sensor Networks

    Directory of Open Access Journals (Sweden)

    Juan Chen

    2015-11-01

    Full Text Available Wireless sensor networks are widely used to monitor valuable objects such as rare animals or armies. Once an object is detected, the source, i.e., the sensor nearest to the object, generates and periodically sends a packet about the object to the base station. Since attackers can capture the object by localizing the source, many protocols have been proposed to protect source location. Instead of transmitting the packet to the base station directly, typical source location protection protocols first transmit packets randomly for a few hops to a phantom location, and then forward the packets to the base station. The problem with these protocols is that the generated phantom locations are usually not only near the true source but also close to each other. As a result, attackers can easily trace a route back to the source from the phantom locations. To address the above problem, we propose a new protocol for source location protection based on limited flooding, named SLP. Compared with existing protocols, SLP can generate phantom locations that are not only far away from the source, but also widely distributed. It improves source location security significantly with low communication cost. We further propose a protocol, namely SLP-E, to protect source location against more powerful attackers with wider fields of vision. The performance of our SLP and SLP-E are validated by both theoretical analysis and simulation results.

  13. EUV secondary electron blur at the 22nm half pitch node

    Science.gov (United States)

    Gronheid, Roel; Younkin, Todd R.; Leeson, Michael J.; Fonseca, Carlos; Hooge, Joshua S.; Nafus, Kathleen; Biafore, John J.; Smith, Mark D.

    2011-04-01

    In this paper the Arrhenius behavior of blur upon EUV exposure is investigated through variation of the PEB temperature. In this way, thermally activated parameters that contribute to blur (such as acid/base diffusion) can be separated from non-thermally activated parameters (such as secondary electron blur). The experimental results are analyzed in detail using multi-wavelength resist modeling based on the continuum approach and through fitting of the EUV data using stochastic resist models. The extracted blur kinetics display perfectly linear Arrhenius behavior, indicating that there is no sign for secondary electron blur at 22nm half pitch. At the lowest PEB setting the total blur length is ~4nm, indicating that secondary electron blur should be well below that. The stochastic resist model gives a best fit to the current data set with parameters that result in a maximum probability of acid generation at 2.4nm from the photon absorption site. Extrapolation of the model predicts that towards the 16nm half pitch the impact on sizing dose is minimal and an acceptable exposure latitude is achievable. In order to limit the impact on line width roughness at these dimensions it will be required to control acid diffusion to ~5nm.

  14. Fibrillar Chromospheric Spicule-Like Counterparts to an EUV and Soft X-Ray Blowout Coronal Jet

    Science.gov (United States)

    Sterling, Alphonse C.; Harra, Louise K.; Moore, Ronald L.

    2010-01-01

    We observe an erupting jet feature in a solar polar coronal hole, using data from Hinode/SOT, EIS, and XRT, with supplemental data from STEREO/EUVI. From EUV and soft X-ray (SXR) images we identify the erupting feature as a blowout coronal jet: in SXRs it is a jet with bright base, and in EUV it appears as an eruption of relatively cool (approximately 50,000 K) material of horizontal size scale approximately 30" originating from the base of the SXR jet. In SOT Ca II H images the most pronounced analog is a pair of thin (approximately 1") ejections, at the locations of either of the two legs of the erupting EUV jet. These Ca II features eventually rise beyond 45", leaving the SOT field of view, and have an appearance similar to standard spicules except that they are much taller. They have velocities similar to that of "type II" spicules, approximately 100 kilometers per second, and they appear to have spicule-like substructures splitting off from them with horizontal velocity approximately 50 kilometers per second, similar to the velocities of splitting spicules measured by Sterling et al. (2010). Motions of splitting features and of other substructures suggest that the macroscopic EUV jet is spinning or unwinding as it is ejected. This and earlier work suggests that a sub-population of Ca II type II spicules are the Ca II manifestation of portions of larger-scale erupting magnetic jets. A different sub-population of type II spicules could be blowout jets occurring on a much smaller horizontal size scale than the event we observe here.

  15. Different source image fusion based on FPGA

    Science.gov (United States)

    Luo, Xiao; Piao, Yan

    2016-03-01

    The fusion technology of video image is to make the video obtained by different image sensors complementary to each other by some technical means, so as to obtain the video information which is rich in information and suitable for the human eye system. Infrared cameras in harsh environments such as when smoke, fog and low light situations penetrating power, but the ability to obtain the details of the image is poor, does not meet the human visual system. Single visible light imaging can be rich in detail, high resolution images and for the visual system, but the visible image easily affected by the external environment. Infrared image and visible image fusion process involved in the video image fusion algorithm complexity and high calculation capacity, have occupied more memory resources, high clock rate requirements, such as software, c ++, c, etc. to achieve more, but based on Hardware platform less. In this paper, based on the imaging characteristics of infrared images and visible light images, the software and hardware are combined to obtain the registration parameters through software matlab, and the gray level weighted average method is used to implement the hardware platform. Information fusion, and finally the fusion image can achieve the goal of effectively improving the acquisition of information to increase the amount of information in the image.

  16. Basic issues associated with four potential EUV resist schemes

    Energy Technology Data Exchange (ETDEWEB)

    Wheeler, D.R. [Sandia National Labs., Albuquerque, NM (United States); Kubiak, G.; Ray-Chaudhuri, A.; Henderson, C. [Sandia National Labs., Livermore, CA (United States)

    1996-06-01

    Four of the better developed resist schemes that are outgrowths of DUV (248 and 193 nm) resist development are considered as candidates for EUV. They are as follows: trilayer, a thin imaging layer on top of a refractor masking/pattern transfer layer on top of a planarizing and processing layer (PPL); solution developed, organometallic bilayer where the imaging and masking layer have been combined into one material on top of a PPL; and finally silylated resists. They are examined in a very general form without regard to the specifics of chemistry of the variations within each group, but rather to what is common to each group and how that affects their effectiveness as candidates for a near term EUV resist. In particular they are examined with respect to sensitivity, potential resolution, optical density, etching selectivity during pattern transfer, and any issues associated with pattern fidelity such as swelling.

  17. Contribution of EUV mask CD variability on LCDU

    Science.gov (United States)

    Qi, Zhengqing John; Rankin, Jed; Sun, Lei; Levinson, Harry

    2017-03-01

    The shrink in feature sizes enabled by EUV lithography introduces a regime where stochastic limits to resolution can manifest in the form of line edge roughness (LER) for line/space patterns and local critical dimension uniformity (LCDU) for contact/holes. To meet increasing tolerances on edge placement error (EPE) and suppression of stochastic effects, an understanding of EUV mask contributions on lithographic patterning variability is essential. The work here explores stochastic noise originating from the mask patterning process and attempts to quantify its contributions towards on-wafer LCDU. A semiempirical approach was used to statistically decompose the mask variability component from the measured LCDU and provide a first-order understanding of the mask's impact on wafer. Taking a more direct approach, a one-to-one correlation of local CD variation between mask and wafer was also experimentally shown, presenting the possibility for predicting the contributions and impact of mask LCDU on wafer prior to exposure.

  18. Optical, UV, and EUV Oscillations of SS Cygni in Outburst

    Science.gov (United States)

    Mauche, Christopher W.

    2004-07-01

    I provide a review of observations in the optical, UV (HST), and EUV (EUVE and Chandra LETG) of the rapid periodic oscillations of nonmagnetic, disk-accreting, high mass-accretion rate cataclysmic variables (CVs), with particular emphasis on the dwarf nova SS Cyg in outburst. In addition, I drawn attention to a correlation, valid over nearly six orders of magnitude in frequency, between the frequencies of the quasi-periodic oscillations (QPOs) of white dwarf, neutron star, and black hole binaries. This correlation identifies the high frequency quasi-coherent oscillations (so-called ``dwarf nova oscillations'') of CVs with the kilohertz QPOs of low mass X-ray binaries (LMXBs), and the low frequency and low coherence QPOs of CVs with the horizontal branch oscillations (or the broad noise component identified as such) of LMXBs. Assuming that the same mechanisms produce the QPOs of white dwarf, neutron star, and black hole binaries, this correlation has important implications for QPO models.

  19. EUV mask reflectivity measurements with micron-scale spatial resolution

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Rekawa, S.B.; Kemp, C.D.; Barty, A.; Anderson, E.H.; Kearney, Patrick; Han, Hakseung

    2008-05-26

    The effort to produce defect-free mask blanks for EUV lithography relies on increasing the detection sensitivity of advanced mask inspection tools, operating at several wavelengths. We describe the unique measurement capabilities of a prototype actinic (EUV wavelength) microscope that is capable of detecting small defects and reflectivity changes that occur on the scale of microns to nanometers. Types of defects: (a) Buried Substrate Defects: particles & pits (causes amplitude and/or phase variations); (b) Surface Contamination (reduces reflectivity and (possibly) contrast); (c) Damage from Inspection and Use (reduces the reflectivity of the multilayer coating). This paper presents an overview of several topics where scanning actinic inspection makes a unique contribution to EUVL research. We describe the role of actinic scanning inspection in four cases: defect repair studies; observations of laser damage; after scanning electron microscopy; and native and programmed defects.

  20. Theoretical EUV spectrum of near Pd-like Xe

    CERN Document Server

    Sasaki, A

    2003-01-01

    The EUV spectrum of multiple charged Xe ion is theoretically investigated. The strong emission in the 11 nm band is attributed to 4d-4f transitions of Xe sup 7 sup + to Xe sup 1 sup 8 sup +. The 4d-5p transition of Xe sup 1 sup 0 sup + contributes to the emission in the 13.5 nm band from low density plasma. (author)

  1. High-Resolution EUV Spectroscopy of White Dwarfs

    Science.gov (United States)

    Kowalski, Michael P.; Wood, K. S.; Barstow, M. A.

    2014-01-01

    We compare results of high-resolution EUV spectroscopic measurements of the isolated white dwarf G191-B2B and the binary system Feige 24 obtained with the J-PEX (Joint Plasmadynamic Experiment), which was sponsored jointly by the U.S. Naval Research Laboratory and NASA. J-PEX delivers the world's highest resolution in EUV and does so at high effective area (e.g., more effective area in a sounding rocket than is available with Chandra at adjacent energies, but in a waveband Chandra cannot reach). The capability J-PEX represents is applicable to the astrophysics of hot plasmas in stellar coronae, white dwarfs and the ISM. G191-B2B and Feige 24 are quite distinct hot white dwarf systems having in common that they are bright in the portion of the EUV where He emission features and edges occur, hence they can be exploited to probe both the stellar atmosphere and the ISM, separating those components by model-fitting that sums over all relevant (He) spectral features in the band. There is evidence from these fits that atmospheric He is being detected but the result is more conservatively cast as a pair of upper limits. We discuss how longer duration satellite observations with the same instrumentation could increase exposure to detect atmospheric He in these and other nearby hot white dwarfs.

  2. The Extreme Ultraviolet (EUV) Instrument for the MAVEN Mission

    Science.gov (United States)

    Chamberlin, Phillip C.

    2012-01-01

    The Mars Atmosphere and Volatile Evolution Mission (MAVEN) will explore the variability in the planet's upper atmosphere and ionosphere that is dominated by interactions with the sun, specifically the high-energy photons in the soft X-ray and extreme ultraviolet wavelengths as well as interactions with the solar wind. Scientists will use MAVEN data to determine the current loss rate of volatile compounds from the Mars atmosphere, then extrapolate back in time in order to give historical estimations of state of the Mars atmosphere and climate, its ability to sustain liquid water, and the potential for the Martian habitability. The EUV instrument is critical in measuring the Space Weather driver of this atmospheric variability. It will directly observe a three EUV wavelength ranges and their variability due to solar flares (time scales of seconds to hours) as well as active region evolution (months), which will then act as proxies for a model to determine the entire 0.1-200 nm solar spectrum at all times during the MAVEN mission. These EUV measurements and models results will compliment the other instruments that will provide direct in-situ as well as remote sensing observations of the Martian atmospheric response to this solar driver. This presentation will be an introduction of this instrument and its science measurements and goals to the larger community, as well as a status report on its progress.

  3. Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Huadong; Zhang, Jun; Ma, Suli [Key Laboratory of Solar Activity, National Astronomical Observatories, Chinese Academy of Sciences, Beijing 100012 (China); Yan, Xiaoli [Yunnan Observatories, Chinese Academy of Sciences, Kunming 650011 (China); Xue, Jianchao, E-mail: hdchen@nao.cas.cn, E-mail: zjun@nao.cas.cn [Key Laboratory for Dark Matter and Space Science, Purple Mountain Observatory, Chinese Academy of Sciences, Nanjing 210008 (China)

    2017-05-20

    We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19–20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearby coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ∼280 km s{sup −1}. During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ∼8 G.

  4. Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

    Science.gov (United States)

    Chen, Huadong; Zhang, Jun; Ma, Suli; Yan, Xiaoli; Xue, Jianchao

    2017-05-01

    We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19-20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearby coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ˜280 km s-1. During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ˜8 G.

  5. Difference in EUV photoresist design towards reduction of LWR and LCDU

    Science.gov (United States)

    Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert

    2017-03-01

    Pattern fidelity of EUV lithography is crucial for high resolution features, since small variation can affect device performance and even cause short or open circuit. For 1D features, dense lines and contact holes are the most common features for active, metal and contact layer, therefore line width roughness (LWR) and local critical dimension uniformity (LCDU) are important indexes to monitor. Both LWR and LCDU are greatly influenced by photon and acid shot noise. In addition, LWR is also affected by resist mechanical properties, like pattern collapse. In this study, we studied the influence of different chemically amplified resist components, such as polymer, PAG and quencher for both types and concentrations in order to understand the relative extent of influences of deprotection, acid diffusion, and base neutralization on pattern fidelity. However, conventional methods to approach higher resolution or low LWR/LCDU by sacrificing the dose are not sustainable. In order to continue to improve resist performance, a new component, metal salt sensitizer, is introduced into the resist system. This metal salt is able to achieve 30% dose reduction by increasing EUV absorption, maintaining LWR. We believe metal sensitizer might give us a new way to challenge the RLS trade-off.

  6. Studying secondary electron behavior in EUV resists using experimentation and modeling

    Science.gov (United States)

    Narasimhan, Amrit; Grzeskowiak, Steven; Srivats, Bharath; Herbol, Henry; Wisehart, Liam; Kelly, Chris; Earley, William; Ocola, Leonidas E.; Neisser, Mark; Denbeaux, Gregory; Brainard, Robert L.

    2015-03-01

    EUV photons expose photoresists by complex interactions starting with photoionization that create primary electrons (~80 eV), followed by ionization steps that create secondary electrons (10-60 eV). Ultimately, these lower energy electrons interact with specific molecules in the resist that cause the chemical reactions which are responsible for changes in solubility. The mechanisms by which these electrons interact with resist components are key to optimizing the performance of EUV resists. An electron exposure chamber was built to probe the behavior of electrons within photoresists. Upon exposure and development of a photoresist to an electron gun, ellipsometry was used to identify the dependence of electron penetration depth and number of reactions on dose and energy. Additionally, our group has updated a robust software that uses first-principles based Monte Carlo model called "LESiS", to track secondary electron production, penetration depth, and reaction mechanisms within materials-defined environments. LESiS was used to model the thickness loss experiments to validate its performance with respect to simulated electron penetration depths to inform future modeling work.

  7. ECR ion source based low energy ion beam facility

    Indian Academy of Sciences (India)

    A nanogan type of ECR source based on a fully permanent magnet design was chosen for this purpose [3]. The ECR ion source along with all its peripheral electron- ics and vacuum components placed on a 200 kV high voltage platform provides multiply charged positive ions in a widely varying energy range from a few ...

  8. Double slit interferometry to measure the EUV refractive indices of solids using high harmonics.

    Science.gov (United States)

    Wilson, Lucy A; Rossall, Andrew K; Wagenaars, Erik; Cacho, Cephise M; Springate, Emma; Turcu, I C Edmond; Tallents, Greg J

    2012-04-20

    Accurate values of the extreme ultraviolet (EUV) optical properties of materials are required to make EUV optics such as filters and multilayer mirrors. The optical properties of aluminum studied in this report are required, in particular, as aluminum is used as an EUV filter material. The complex refractive index of solid aluminum and the imaginary part of the refractive index of solid iron between 17 eV and 39 eV have been measured using EUV harmonics produced from an 800 nm laser focused to 10(14) Wcm(2) in an argon gas jet impinging on a double slit interferometer.

  9. New paradigms for Salmonella source attribution based on microbial subtyping.

    NARCIS (Netherlands)

    Mughini-Gras, Lapo; Franz, Eelco; van Pelt, Wilfrid

    Microbial subtyping is the most common approach for Salmonella source attribution. Typically, attributions are computed using frequency-matching models like the Dutch and Danish models based on phenotyping data (serotyping, phage-typing, and antimicrobial resistance profiling). Herewith, we

  10. AlInGaN-Based Superlattice Terahertz Source Project

    Data.gov (United States)

    National Aeronautics and Space Administration — WaveBand Corporation in collaboration with Virginia Commonwealth University proposes to design and fabricate a new sub-millimeter source based on an InAlGaN...

  11. A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

    Energy Technology Data Exchange (ETDEWEB)

    Huh, S.; Ren, L.; Chan, D.; Wurm, S.; Goldberg, K. A.; Mochi, I.; Nakajima, T.; Kishimoto, M.; Ahn, B.; Kang, I.; Park, J.-O.; Cho, K.; Han, S.-I.; Laursen, T.

    2010-03-12

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. yet link data is available for understanding native defects on real masks. In this paper, a full-field EUV mask is fabricated to investigate the printability of various defects on the mask. The printability of defects and identification of their source from mask fabrication to handling were studied using wafer inspection. The printable blank defect density excluding particles and patterns is 0.63 cm{sup 2}. Mask inspection is shown to have better sensitivity than wafer inspection. The sensitivity of wafer inspection must be improved using through-focus analysis and a different wafer stack.

  12. Voltage Sag Source Location Based on Instantaneous Energy Detection

    DEFF Research Database (Denmark)

    Chen, Zhe; Kong, Wei; Dong, Xinzhou

    2008-01-01

    Voltage sag is a major power quality problem, which could disrupt the operation of voltage-sensitive equipment. This paper presents the method based on variation components-based instantaneous energy for voltage sag source detection. Simulations have been performed to provide the thorough analysis...... for system with distributed generation units. The studies show that the presented method can effectively detect the location of voltage sag source....

  13. Investigation of noise sources in upconversion based infrared hyperspectral imaging

    DEFF Research Database (Denmark)

    Kehlet, Louis Martinus; Tidemand-Lichtenberg, Peter; Beato, Pablo

    2016-01-01

    Noise sources in infrared hyperspectral imaging based on nonlinear frequency upconversion are investigated. The effects on the spectral and spatial content of the images are evaluated and methods of combating them are suggested.......Noise sources in infrared hyperspectral imaging based on nonlinear frequency upconversion are investigated. The effects on the spectral and spatial content of the images are evaluated and methods of combating them are suggested....

  14. An accelerator-based epithermal photoneutron source for BNCT

    Energy Technology Data Exchange (ETDEWEB)

    Nigg, D.W.; Mitchell, H.E.; Harker, Y.D.; Yoon, W.Y. [and others

    1995-11-01

    Therapeutically-useful epithermal-neutron beams for BNCT are currently generated by nuclear reactors. Various accelerator-based neutron sources for BNCT have been proposed and some low intensity prototypes of such sources, generally featuring the use of proton beams and beryllium or lithium targets have been constructed. This paper describes an alternate approach to the realization of a clinically useful accelerator-based source of epithermal neutrons for BNCT that reconciles the often conflicting objectives of target cooling, neutron beam intensity, and neutron beam spectral purity via a two stage photoneutron production process.

  15. Energy-Based Acoustic Source Localization Methods: A Survey

    Directory of Open Access Journals (Sweden)

    Wei Meng

    2017-02-01

    Full Text Available Energy-based source localization is an important problem in wireless sensor networks (WSNs, which has been studied actively in the literature. Numerous localization algorithms, e.g., maximum likelihood estimation (MLE and nonlinear-least-squares (NLS methods, have been reported. In the literature, there are relevant review papers for localization in WSNs, e.g., for distance-based localization. However, not much work related to energy-based source localization is covered in the existing review papers. Energy-based methods are proposed and specially designed for a WSN due to its limited sensor capabilities. This paper aims to give a comprehensive review of these different algorithms for energy-based single and multiple source localization problems, their merits and demerits and to point out possible future research directions.

  16. Energy-Based Acoustic Source Localization Methods: A Survey.

    Science.gov (United States)

    Meng, Wei; Xiao, Wendong

    2017-02-15

    Energy-based source localization is an important problem in wireless sensor networks (WSNs), which has been studied actively in the literature. Numerous localization algorithms, e.g., maximum likelihood estimation (MLE) and nonlinear-least-squares (NLS) methods, have been reported. In the literature, there are relevant review papers for localization in WSNs, e.g., for distance-based localization. However, not much work related to energy-based source localization is covered in the existing review papers. Energy-based methods are proposed and specially designed for a WSN due to its limited sensor capabilities. This paper aims to give a comprehensive review of these different algorithms for energy-based single and multiple source localization problems, their merits and demerits and to point out possible future research directions.

  17. Virtual-Impedance-Based Control for Voltage-Source and Current-Source Converters

    DEFF Research Database (Denmark)

    Wang, Xiongfei; Li, YunWei; Blaabjerg, Frede

    2015-01-01

    The virtual impedance concept is increasingly used for the control of power electronic systems. Generally, the virtual impedance loop can either be embedded as an additional degree of freedom for active stabilization and disturbance rejection, or be employed as a command reference generator...... for the converters to provide ancillary services. This paper presents an overview of the virtual-impedance-based control strategies for voltage-source and current-source converters. The control output impedance shaping attained by the virtual impedances is generalized first using the impedance-based models...

  18. Development of outcome-based, multipollutant mobile source indicators.

    Science.gov (United States)

    Pachon, Jorge E; Balachandran, Sivaraman; Hu, Yongtao; Mulholland, James A; Darrow, Lyndsey A; Sarnat, Jeremy A; Tolbert, Paige E; Russell, Armistead G

    2012-04-01

    Multipollutant indicators of mobile source impacts are developed from readily available CO, NOx, and elemental carbon (EC) data for use in air quality and epidemiologic analysis. Two types of outcome-based Integrated Mobile Source Indicators (IMSI) are assessed. The first is derived from analysis of emissions of EC, CO, and NOx such that pollutant concentrations are mixed and weighted based on emission ratios for both gasoline and diesel vehicles. The emission-based indicators (IMSI(EB)) capture the impact of mobile sources on air quality estimated from receptor models and their uncertainty is comparable to measurement and source apportionment uncertainties. The IMSI(EB) have larger correlation between two different receptor sites impacted by traffic than single pollutants, suggesting they are better indicators of the local impact ofmobile sources. A sensitivity analysis of fractions of pollutants in a two-pollutant mixture and the inclusion in an epidemiologic model is conducted to develop a second set of indicators based on health outcomes. The health-based indicators (IMSI(HB)) are weighted combinations of CO, NOx, and EC pairs that have the lowest P value in their association with cardiovascular disease emergency department visits, possibly due to their better spatial representativeness. These outcome-based, multipollutant indicators can provide support for the setting of multipollutant air quality standards and other air quality management activities.

  19. Six transformer based asymmetrical embedded Z-source inverters

    DEFF Research Database (Denmark)

    Wei, Mo; Poh Chiang, Loh; Chi, Jin

    2013-01-01

    Embedded/Asymmetrical embedded Z-source inverters were proposed to maintain smooth input current/voltage across the dc source and within the impedance network, remain the shoot-through feature used to boost up the dc-link voltage without adding bulky filter at input side. This paper introduces a ...... a class of transformer based asymmetrical embedded Z-source inverters which keep the smooth input current and voltage while achieving enhanced voltage boost capability. The presented inverters are verified by laboratory prototypes experimentally.......Embedded/Asymmetrical embedded Z-source inverters were proposed to maintain smooth input current/voltage across the dc source and within the impedance network, remain the shoot-through feature used to boost up the dc-link voltage without adding bulky filter at input side. This paper introduces...

  20. Asymmetrical transformer-based embedded Z-source inverters

    DEFF Research Database (Denmark)

    Wei, Mo; Loh, Poh Chiang; Blaabjerg, Frede

    2013-01-01

    their performances, a number of asymmetrical transformer-based embedded Z-source inverters are proposed. Through theoretical derivation and experiments, the proposed inverters have been shown to draw a smooth input current and produce a high gain by varying the transformer turns ratio n. The range of variation for n......Z-source inverters are inverters with buck-boost capability that traditional inverters cannot match. Despite this ability, present Z-source topologies are burdened by some limitations such as chopping input current, high-voltage stress and poor spectral performance at high gain. To improve...

  1. Permanent magnet based dipole magnets for next generation light sources

    Directory of Open Access Journals (Sweden)

    Takahiro Watanabe

    2017-07-01

    Full Text Available We have developed permanent magnet based dipole magnets for the next generation light sources. Permanent magnets are advantageous over electromagnets in that they consume less power, are physically more compact, and there is a less risk of power supply failure. However, experience with electromagnets and permanent magnets in the field of accelerators shows that there are still challenges to replacing main magnets of accelerators for light sources with permanent magnets. These include the adjustability of the magnetic field, the temperature dependence of permanent magnets, and the issue of demagnetization. In this paper, we present a design for magnets for future light sources, supported by experimental and numerical results.

  2. Carbon induced extreme ultraviolet (EUV) reflectance loss characterized using visible-light ellipsometry

    NARCIS (Netherlands)

    Chen, Juequan; Chen, Juequan; Louis, Eric; Louis, Eric; Wormeester, Herbert; Harmsen, Rob; van de Kruijs, Robbert Wilhelmus Elisabeth; Lee, Christopher James; van Schaik, Willem; Bijkerk, Frederik

    2011-01-01

    Carbon deposition on extreme ultraviolet (EUV) optics was observed due to photon-induced dissociation of hydrocarbons in a EUV lithography environment. The reflectance loss of the multilayer mirror is determined by the carbon layer thickness and density. To study the influence of various forms of

  3. EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror

    NARCIS (Netherlands)

    Huang, Qiushi; Louis, Eric; Bijkerk, Frederik; de Boer, Meint J.; von Blanckenhagen, G.

    2016-01-01

    A multilayer mirror (M) reflecting extreme ultraviolet (EUV) radiation from a first wave-length range in a EUV spectral region comprises a substrate (SUB) and a stack of layers (SL) on the substrate, the stack of layers comprising layers comprising a low index material and a high index material, the

  4. Sounding rocket measurement of the absolute solar EUV flux utilizing a silicon photodiode

    Science.gov (United States)

    Ogawa, H. S.; Mcmullin, D.; Judge, D. L.; Canfield, L. R.

    1990-01-01

    A newly developed stable and high quantum efficiency silicon photodiode was used to obtain an accurate measurement of the integrated absolute magnitude of the solar extreme UV photon flux in the spectral region between 50 and 800 A. The adjusted daily 10.7-cm solar radio flux and sunspot number were 168.4 and 121, respectively. The unattenuated absolute value of the solar EUV flux at 1 AU in the specified wavelength region was 6.81 x 10 to the 10th photons/sq cm per s. Based on a nominal probable error of 7 percent for National Institute of Standards and Technology detector efficiency measurements in the 50- to 500-A region (5 percent on longer wavelength measurements between 500 and 1216 A), and based on experimental errors associated with the present rocket instrumentation and analysis, a conservative total error estimate of about 14 percent is assigned to the absolute integral solar flux obtained.

  5. Plagiarism and Source Deception Detection Based on Syntax Analysis

    Directory of Open Access Journals (Sweden)

    Eman Salih Al-Shamery

    2017-02-01

    Full Text Available In this research, the shingle algorithm with Jaccard method are employed as a new approach to detect deception in sources in addition to detect plagiarism . Source deception occurs as a result of taking a particular text from a source and relative it to another source, while plagiarism occurs in the documents as a result of taking part or all of the text belong to another research, this approach is based on Shingle algorithm with Jaccard coefficient , Shingling is an efficient way to compare the set of shingle in the files that contain text which are used as a feature to measure the syntactic similarity of the documents and it will work with Jaccard coefficient that measures similarity between sample sets . In this proposed system, text will be checked whether it contains syntax plagiarism or not and gives a percentage of similarity with other documents , As well as research sources will be checked to detect deception in source , by matching it with available sources from Turnitin report of the same research by using shingle algorithm with Jaccard coefficient. The motivations of this work is to discovery of literary thefts that occur on the researches , especially what students are doing in their researches , also discover the deception that occurs in the sources.

  6. Progress in Mirror-Based Fusion Neutron Source Development

    Science.gov (United States)

    Anikeev, A. V.; Bagryansky, P. A.; Beklemishev, A. D.; Ivanov, A. A.; Kolesnikov, E. Yu.; Korzhavina, M. S.; Korobeinikova, O. A.; Lizunov, A. A.; Maximov, V. V.; Murakhtin, S. V.; Pinzhenin, E. I.; Prikhodko, V. V.; Soldatkina, E. I.; Solomakhin, A. L.; Tsidulko, Yu. A.; Yakovlev, D. V.; Yurov, D. V.

    2015-01-01

    The Budker Institute of Nuclear Physics in worldwide collaboration has developed a project of a 14 MeV neutron source for fusion material studies and other applications. The projected neutron source of the plasma type is based on the gas dynamic trap (GDT), which is a special magnetic mirror system for plasma confinement. Essential progress in plasma parameters has been achieved in recent experiments at the GDT facility in the Budker Institute, which is a hydrogen (deuterium) prototype of the source. Stable confinement of hot-ion plasmas with the relative pressure exceeding 0.5 was demonstrated. The electron temperature was increased up to 0.9 keV in the regime with additional electron cyclotron resonance heating (ECRH) of a moderate power. These parameters are the record for axisymmetric open mirror traps. These achievements elevate the projects of a GDT-based neutron source on a higher level of competitive ability and make it possible to construct a source with parameters suitable for materials testing today. The paper presents the progress in experimental studies and numerical simulations of the mirror-based fusion neutron source and its possible applications including a fusion material test facility and a fusion-fission hybrid system. PMID:28793722

  7. Measurements and Modeling of Heliospheric EUV Spectral Irradiance and Luminosity

    Science.gov (United States)

    Floyd, L. E.; McMullin, D. R.; Auchere, F.

    2012-12-01

    For more than 15 years, The EIT and the later EUVI instruments aboard SoHO and STEREO, respectively, have provided a time series of images of the solar radiance in the HeII 30.4 nm transition region and three coronal emission lines (FeIX/X, FeXII, and FeXV) of differing temperatures. While the EIT measurements were gathered from a position very near to the Earth-Sun axis, the EUVI measurements were gathered at angles ranging up to and in excess of ±90 degrees in solar longitude from the Earth-Sun axis. Using a Differential Emission Measure (DEM) model, these measurements provide the basis for estimates of the spectral irradiance for the entire solar spectrum up to about 50 nm at any position in the heliosphere. These spectra are utilized in this work for two purposes. First, the photoionization rate of neutral He at each position is calculated. Neutral He is of interest because it traverses the heliopause relatively undisturbed and therefore provides a measure of isotopic parameters beyond the heliosphere. Second, we use these generate a time series of estimates of the solar EUV spectral luminosity extending from the recent post Solar Cycle 23 minimum into the current unusually weak rise of Solar Cycle 24. Because this EUV spectral luminosity is the sum of all solar radiation at each wavelength in every direction, their time series should not contain any systematic 27-day solar rotation periodicities as do typical solar activity indices and its presence would be an indication of time series reliability. This EUV luminosity time series is compared with other solar indices such as SSN and the F10.7 radio flux.

  8. Mirror contamination and secondary electron effects during EUV reflectivity analysis

    Science.gov (United States)

    Catalfano, M.; Kanjilal, A.; Al-Ajlony, A.; Harilal, S. S.; Hassanein, A.; Rice, B.

    2012-03-01

    We investigated Ru mirror contamination and subsequent EUV reflectivity loss using the IMPACT facility at Purdue University. Because Ru can either be used as a grazing mirror or as a capping layer for multilayer normal mirror, we examined the angular dependency of XPS peak area intensity at the O 1s and Ru 3d regions as well as the effects of sputtering. Although no change in intensity has been observed at lower take-off angles from the target surface, the peak area intensity starts changing with increasing θ (i.e., emission observation angle, representing the angle between the target surface plane and detector entrance). Among different components, the effect of water and oxidized carbon are found to be most notable when viewed at lower θ, and primarily responsible for degrading the reflectivity of the Ru layer. On the other hand, the effect of OH becomes dominant with increasing observation angle θ, and thus plays a key role to suppress optical transmission. Moreover, atomic carbon effect is found to peak when observed at 30°, and most likely plays an important role in degrading both reflectivity and transmission. This is also because of the total photon path length in the Ru film at different angles. During the contamination process, the EUV reflectivity of the Ru film is found to significantly degrade in the presence of additional secondary electrons from the focusing Ru mirror of the EUV setup. This effect could be explained in the light of a competition between oxidation and carbonization processes on Ru surface.

  9. EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

    Science.gov (United States)

    Putna, E. Steve; Younkin, Todd R.; Leeson, Michael; Caudillo, Roman; Bacuita, Terence; Shah, Uday; Chandhok, Manish

    2011-04-01

    The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. According to recent assessments made at the 2010 EUVL Symposium, the readiness of EUV materials remains one of the top risk items for EUV adoption. The main development issue regarding EUV resists has been how to simultaneously achieve high resolution, high sensitivity, and low line width roughness (LWR). This paper describes our strategy, the current status of EUV materials, and the integrated post-development LWR reduction efforts made at Intel Corporation. Data collected utilizing Intel's Micro- Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <=11.3mJ/cm2 with <=3nm LWR.

  10. Source versus Residence Based Taxation with International Mergers and Acquisitions

    OpenAIRE

    Becker, Johannes; Fuest, Clemens

    2009-01-01

    This paper analyses tax competition and tax coordination in a model where capital flows occur in the form of mergers and acquisitions, rather than greenfield investment. In this framework, we show that differences in residence based taxes do not necessarily distort international ownership patterns. Moreover, tax competition yields globally efficient levels of source based corporate income taxes if residence based taxes on capital income are absent. In contrast, in the presence of residence ba...

  11. Anti-parallel filament flows and bright dots observed in the EUV with Hi-C

    Science.gov (United States)

    Alexander, C. E.; Regnier, S.; Walsh, R. W.; Winebarger, A. R.; Cirtain, J. W.

    2013-12-01

    The Hi-C instrument imaged the million degree corona at the highest spatial and temporal resolution to date. The instrument imaged a complicated active region which contained several interesting features. Scientists at UCLan in the UK, in collaboration with other members of the Hi-C science team, studied two of these festures: anti-parallel filament flows and bright EUV dots. Plasma flows within prominences/filaments have been observed for many years and hold valuable clues concerning the mass and energy balance within these structures. Evidence of ';counter-steaming' flows has previously been inferred from these cool plasma observations but now, for the first time, these flows have been directly imaged along fundamental filament threads within the million degree corona (at 193 Å). We present observations of an active region filament observed with Hi-C that exhibits anti-parallel flows along adjacent filament threads. The ultra-high spatial and temporal resolution of Hi-C allow the anti-parallel flow velocities to be measured (70 - 80 km/s) and gives an indication of the resolvable thickness of the individual strands (0.8' × 0.1'). The temperature distribution of the plasma flows was estimated to be log T(K) = 5.45 × 0.10 using EM loci analysis. Short-lived, small brightenings sparkling at the edge of the active region, calle EUV Bright Dots (EBDs) were also investigated. EBDs have a characteristic duration of 25 s with a characteristic length of 680 km. These brightenings are not fully resolved by the SDO/AIA instrument at the same wavelength, but can however be identified with respect to the Hi-C location of the EBDs. In addition, EBDs are seen in other chromospheric/coronal channels of SDO/AIA suggesting a temperature between 0.5 and 1.5 MK. Based on a potential field extrapolation from an SDO/HMI magnetogram, the EBDs appear at the footpoints of large-scale trans-equatorial coronal loops. The Hi-C observations provide the first evidence of small-scale EUV

  12. Enhancing EUV mask blanks usability through smart shift and blank-design pairing optimization

    Science.gov (United States)

    Soni, Rakesh Kumar; Paninjath, Sankaranarayanan; Pereira, Mark; Buck, Peter; Thwaite, Peter

    2016-10-01

    EUV Defect avoidance techniques will play a vital role in extreme ultraviolet lithography (EUVL) photomask fabrication with the anticipation that defect free mask blanks won't be available and that cost effective techniques will not be available for defect repairing. In addition, mask shops may not have a large inventory of expensive EUV mask blanks. Given these facts, defect avoidance can be used as cost effective technique to optimize the mask blank and design data (mask data) pair selection across mask blank manufacturers and mask shops so that overall mask blank utilization can be enhanced. In previous work, it was determined that the pattern shift based solution increases the chance that a defective mask blank can be used that would otherwise be discarded [1]. In pattern shift, design data is shifted such that defects are either moved to isolated regions or hidden under the patterns that are written. However pattern shifts techniques don't perform well with masks with higher defect counts. Pattern shift techniques in this form assume all defects to be equally critical. In addition, a defect is critical or important only if it lands on the main pattern. A defect landing on fill, sub-resolution assist feature (SRAF) or fiducial areas may not be critical. In this paper we assess the performance of pattern shift techniques assuming defects that are not critical based upon size or type, as well as defects landing in non-critical areas (smart shift) can be ignored. In a production mask manufacturing environment it is necessary to co-optimize and prioritize blank-design pairing for multiple mask layouts in the queue with the available blanks. A blank-design pairing tool maximizes the utilization of blanks by finding the best pairing between blanks and design data so that the maximum number of mask blanks can be used. In this paper we also propose a novel process which would optimize the usage of costly EUV mask blanks across mask blank manufacturers and mask shops

  13. Performance evaluation of a permanent ring magnet based helicon plasma source for negative ion source research

    Science.gov (United States)

    Pandey, Arun; Bandyopadhyay, M.; Sudhir, Dass; Chakraborty, A.

    2017-10-01

    Helicon wave heated plasmas are much more efficient in terms of ionization per unit power consumed. A permanent magnet based compact helicon wave heated plasma source is developed in the Institute for Plasma Research, after carefully optimizing the geometry, the frequency of the RF power, and the magnetic field conditions. The HELicon Experiment for Negative ion-I source is the single driver helicon plasma source that is being studied for the development of a large sized, multi-driver negative hydrogen ion source. In this paper, the details about the single driver machine and the results from the characterization of the device are presented. A parametric study at different pressures and magnetic field values using a 13.56 MHz RF source has been carried out in argon plasma, as an initial step towards source characterization. A theoretical model is also presented for the particle and power balance in the plasma. The ambipolar diffusion process taking place in a magnetized helicon plasma is also discussed.

  14. Data-based matched-mode source localization for a moving source.

    Science.gov (United States)

    Yang, T C

    2014-03-01

    A data-based matched-mode source localization method is proposed in this paper for a moving source, using mode wavenumbers and depth functions estimated directly from the data, without requiring any environmental acoustic information and assuming any propagation model. The method is in theory free of the environmental mismatch problem because the mode replicas are estimated from the same data used to localize the source. Besides the estimation error due to the approximations made in deriving the data-based algorithms, the method has some inherent drawbacks: (1) It uses a smaller number of modes than theoretically possible because some modes are not resolved in the measurements, and (2) the depth search is limited to the depth covered by the receivers. Using simulated data, it is found that the performance degradation due to the afore-mentioned approximation/limitation is marginal compared with the original matched-mode source localization method. The proposed method has a potential to estimate the source range and depth for real data and be free of the environmental mismatch problem, noting that certain aspects of the (estimation) algorithms have previously been tested against data. The key issues are discussed in this paper.

  15. Evidence for a New Class of Extreme Ultraviolet Sources

    Science.gov (United States)

    Maoz, Dan; Ofek, Eran O.; Shemi, Amotz

    1997-01-01

    Most of the sources detected in the extreme ultraviolet (EUV; 100-600 A) by the ROSAT/WFC and EUVE all-sky surveys have been identified with active late-type stars and hot white dwarfs that are near enough to the Earth to escape absorption by interstellar gas. However, about 15 per cent of EUV sources are as yet unidentified with any optical counterparts. We examine whether the unidentified EUV sources may consist of the same population of late-type stars and white dwarfs. We present B and R photometry of stars in the fields of seven of the unidentified EUV sources. We detect in the optical the entire main-sequence and white dwarf population out to the greatest distances where they could still avoid absorption. We use color-magnitude diagrams to demonstrate that, in most of the fields, none of the observed stars has the colours and magnitudes of late-type dwarfs at distances less than 100 pc. Similarly, none of the observed stars is a white dwarf within 500 pc that is hot enough to be a EUV emitter. The unidentified EUV sources we study are not detected in X-rays, while cataclysmic variables, X-ray binaries, and active galactic nuclei generally are. We conclude that some of the EUV sources may be a new class of nearby objects, which are either very faint at optical bands or which mimic the colours and magnitudes of distant late-type stars or cool white dwarfs. One candidate for optically faint objects is isolated old neutron stars, slowly accreting interstellar matter. Such neutron stars are expected to be abundant in the Galaxy, and have not been unambiguously detected.

  16. Optimization of low-diffusion EUV resist for linewidth roughness and pattern collapse on various substrates

    Science.gov (United States)

    Thackeray, James W.; Cameron, James F.; Wagner, Michael; Coley, Suzanne; Ongayi, Owendi; Montgomery, Warren; Lovell, Dave; Biafore, John; Chakrapani, Vidhya; Ko, Akiteru

    2012-03-01

    This paper will report on our development of low diffusion EUV resists based on polymer-bound PAG technology. With our low diffusion resist, a wide process window for 30-nm hp of 280nm DOF over a 10% exposure range is achieved on a prototype ADT fullfield scanner. Linewidth roughness of 3.1nm is also achieved. Excellent resist profiles can be achieved on organic ULs or Si hardmask materials. This resist also shows only 1.1 nm carbon growth on witness plate mirrors for cleanables, and no reflectivity loss after mirror cleaning. These results clearly pass for use on all NXE exposure tools. We also have shown good pattern transfer for a Si HM stack using this resist. Finally, we report 17-nm hp resolution at a dose of 14.5mj for a higher absorption resist.

  17. High resolution EUV spectroscopy of xenon ions with a compact electron beam ion trap

    Science.gov (United States)

    Ali, Safdar; Nakamura, Nobuyuki

    2017-09-01

    We performed high resolution extreme ultraviolet (EUV) spectroscopy measurements of highly charged xenon ions with a compact electron beam ion trap. The spectra were recorded with a flat-field grazing incidence spectrometer while varying the electron beam energy between 200 and 890 eV. We measured the wavelengths for several lines of Rh-like Xe9+ - Cd-like Xe6+ and Cu-like Xe25+- Se-like Xe20+ in the range of 150-200 Å with an uncertainty of 0.05 Å. Previously, most of these lines have been reported from EBITs with a wavelength uncertainty of 0.2 Å. Additionally, based on the electron beam energy dependence of the observed spectra we tentatively identified three new lines, which were reported as unidentified lines in the previous studies.

  18. High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas.

    Science.gov (United States)

    Musgrave, Christopher S A; Murakami, Takehiro; Ugomori, Teruyuki; Yoshida, Kensuke; Fujioka, Shinsuke; Nishimura, Hiroaki; Atarashi, Hironori; Iyoda, Tomokazu; Nagai, Keiji

    2017-03-01

    With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

  19. Optical, UV, and EUV Oscillations of SS Cygni in Outburst

    Energy Technology Data Exchange (ETDEWEB)

    Mauche, C W

    2003-12-19

    I provide a review of observations in the optical, UV (HST), and EUV (EUVE and Chandra LETG) of the rapid periodic oscillations of nonmagnetic, disk-accreting, high mass-accretion rate cataclysmic variables (CVs), with particular emphasis on the dwarf nova SS Cyg in outburst. In addition, I drawn attention to a correlation, valid over nearly six orders of magnitude in frequency, between the frequencies of the quasi-periodic oscillations (QPOs) of white dwarf, neutron star, and black hole binaries. This correlation identifies the high frequency quasi-coherent oscillations (so-called ''dwarf nova oscillations'') of CVs with the kilohertz QPOs of low mass X-ray binaries (LMXBs), and the low frequency and low coherence QPOs of CVs with the horizontal branch oscillations (or the broad noise component identified as such) of LMXBs. Assuming that the same mechanisms produce the QPOs of white dwarf, neutron star, and black hole binaries, this correlation has important implications for QPO models.

  20. The EUV Emission in Comet-Solar Corona Interactions

    Science.gov (United States)

    Bryans, Paul; Pesnell, William Dean; Schrijver, Carolus J.; Brown, John C.; Battams, Karl; Saint-Hilaire, Pasal; Liu, Wei; Hudson, Hugh S.

    2011-01-01

    The Atmospheric Imaging Assembly (AlA) on the Solar Dynamics Observatory (SDO) viewed a comet as it passed through the solar corona on 2011 July 5. This was the first sighting of a comet by a EUV telescope. For 20 minutes, enhanced emission in several of the AlA wavelength bands marked the path of the comet. We explain this EUV emission by considering the evolution of the cometary atmosphere as it interacts with the ambient solar atmosphere. Water ice in the comet rapidly sublimates as it approaches the Sun. This water vapor is then photodissociated, primarily by Ly-alpha, by the solar radiation field to create atomic Hand O. Other molecules present in the comet also evaporate and dissociate to give atomic Fe and other metals. Subsequent ionization of these atoms can be achieved by a number of means, including photoionization, electron impact, and charge exchange with coronal protons and other highly-charged species. Finally, particles from the cometary atmosphere are thermalized to the background temperature of the corona. Each step could cause emission in the AlA bandpasses. We will report here on their relative contribution to the emission seen in the AlA telescopes.

  1. Security Vulnerabilities of the Web Based Open Source Information ...

    African Journals Online (AJOL)

    This paper exposes security vulnerabilities of the web based Open Source Information Systems (OSIS) from both system angle and human perspectives.It shows the extent of risk that can likely hinder adopting organization from attaning full intended benefits of using OSIS software. To undertake this study, a case study ...

  2. A silicon-based electrical source for surface plasmon polaritons

    NARCIS (Netherlands)

    Walters, Robert J.; van Loon, Rob V.A.; Brunets, I.; Schmitz, Jurriaan; Polman, Albert

    2009-01-01

    This work demonstrates the fabrication of a silicon-based electrical source for surface plasmon polaritons (SPPs) at low temperatures using silicon nanocrystal doped alumina within a metal-insulator-metal (MIM) waveguide geometry. The fabrication method uses established microtechnology processes

  3. Source-Based Tasks in Writing Independent and Integrated Essays

    Science.gov (United States)

    Gholami, Javad; Alinasab, Mahsa

    2017-01-01

    Integrated writing tasks have gained considerable attention in ESL and EFL writing assessment and are frequently needed and used in academic settings and daily life. However, they are very rarely practiced and promoted in writing classes. This paper explored the effects of source-based writing practice on EFL learners' composing abilities and…

  4. High brightness single photon sources based on photonic wires

    DEFF Research Database (Denmark)

    Claudon, J.; Bleuse, J.; Bazin, M.

    2009-01-01

    We present a novel single-photon-source based on the emission of a semiconductor quantum dot embedded in a single-mode photonic wire. This geometry ensures a very large coupling (> 95%) of the spontaneous emission to the guided mode. Numerical simulations show that a photon collection efficiency...... of GaAs and defined by reactive-ion etching....

  5. Spectroscopy of Highly Charged Tin Ions for AN Extreme Ultraviolet Light Source for Lithography

    Science.gov (United States)

    Torretti, Francesco; Windberger, Alexander; Ubachs, Wim; Hoekstra, Ronnie; Versolato, Oscar; Ryabtsev, Alexander; Borschevsky, Anastasia; Berengut, Julian; Crespo Lopez-Urrutia, Jose

    2017-06-01

    Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) light around 13.5 nm in nanolithographic applications. This light is generated primarily by atomic transitions in highly charged tin ions: Sn^{8+}-Sn^{14+}. Due to the electronic configurations of these charge states, thousands of atomic lines emit around 13.5 nm, clustered in a so-called unresolved transition array. As a result, accurate line identification becomes difficult in this regime. Nevertheless, this issue can be circumvented if one turns to the optical: with far fewer atomic states, only tens of transitions take place and the spectra can be resolved with far more ease. We have investigated optical emission lines in an electron-beam-ion-trap (EBIT), where we managed to charge-state resolve the spectra. Based on this technique and on a number of different ab initio techniques for calculating the level structure, the optical spectra could be assigned [1,2]. As a conclusion the assignments of EUV transitions in the literature require corrections. The EUV and optical spectra are measured simultaneously in the controlled conditions of the EBIT as well as in a droplet-based laser-produced plasma source providing information on the contribution of Sn^{q+} charge states to the EUV emission. [1] A. Windberger, F. Torretti, A. Borschevsky, A. Ryabtsev, S. Dobrodey, H. Bekker, E. Eliav, U. Kaldor, W. Ubachs, R. Hoekstra, J.R. Crespo Lopez-Urrutia, O.O. Versolato, Analysis of the fine structure of Sn^{11+} - Sn^{14+} ions by optical spectroscopy in an electron beam ion trap, Phys. Rev. A 94, 012506 (2016). [2] F. Torretti, A. Windberger, A. Ryabtsev, S. Dobrodey, H. Bekker, W. Ubachs, R. Hoekstra, E.V. Kahl, J.C. Berengut, J.R. Crespo Lopez-Urrutia, O.O. Versolato, Optical spectroscopy of complex open 4d-shell ions Sn^{7+} - Sn^{10+}, arXiv:1612.00747

  6. Pixel-based ant colony algorithm for source mask optimization

    Science.gov (United States)

    Kuo, Hung-Fei; Wu, Wei-Chen; Li, Frederick

    2015-03-01

    Source mask optimization (SMO) was considered to be one of the key resolution enhancement techniques for node technology below 20 nm prior to the availability of extreme-ultraviolet tools. SMO has been shown to enlarge the process margins for the critical layer in SRAM and memory cells. In this study, a new illumination shape optimization approach was developed on the basis of the ant colony optimization (ACO) principle. The use of this heuristic pixel-based ACO method in the SMO process provides an advantage over the extant SMO method because of the gradient of the cost function associated with the rapid and stable searching capability of the proposed method. This study was conducted to provide lithographic engineers with references for the quick determination of the optimal illumination shape for complex mask patterns. The test pattern used in this study was a contact layer for SRAM design, with a critical dimension and a minimum pitch of 55 and 110 nm, respectively. The optimized freeform source shape obtained using the ACO method was numerically verified by performing an aerial image investigation, and the result showed that the optimized freeform source shape generated an aerial image profile different from the nominal image profile and with an overall error rate of 9.64%. Furthermore, the overall average critical shape difference was determined to be 1.41, which was lower than that for the other off-axis illumination exposure. The process window results showed an improvement in exposure latitude (EL) and depth of focus (DOF) for the ACO-based freeform source shape compared with those of the Quasar source shape. The maximum EL of the ACO-based freeform source shape reached 7.4% and the DOF was 56 nm at an EL of 5%.

  7. POKEHEAD: An Open Source Interactive Headphone Based HCI Platform

    DEFF Research Database (Denmark)

    Højlund, Marie; Trento, Stefano; Goudarzi, Visda

    2012-01-01

    This paper introduces a novel interactive, human-computer interface and remote social communication system based on an augmented, hi-fidelity audio headphone platform. Specifically, this system- named Pokehead, currently utilizes the DUL embedded open-source accelerometer platform to gather 3-axis......, open source implementation. Our rapid prototype proved to be robust enough to work in performance for demonstration purposes and serves as a working proof of concept. In this paper we provide a technical description of our prototype, illustrate the context and motivation behind the project, and offer...

  8. Microinstallations Based on Renewable Energy Sources in the Construction Sector

    Science.gov (United States)

    Kurzak, Lucjan

    2017-10-01

    The focus of this paper is on the status and prognoses of the use of microinstallations based on renewable energy sources to supply heat and power. The technologies that have been important in Europe and Poland for microgeneration of electricity include photovoltaic systems, micro wind turbines and co-generation systems. Solar collectors, heat pumps and biomass have also been used to generate heat. Microinstallations for renewable energy sources represent the initial point and the foundation for the development of micro networks, intelligent networks and the whole prosumer energy sector.

  9. Laser wakefield accelerator based light sources: potential applications and requirements

    Energy Technology Data Exchange (ETDEWEB)

    Albert, F. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). NIF and Photon Sciences; Thomas, A. G. [Univ. of Michigan, Ann Arbor, MI (United States). Dept. of Nuclear Engineering and Radiological Sciences; Mangles, S. P.D. [Imperial College, London (United Kingdom). Blackett Lab.; Banerjee, S. [Univ. of Nebraska, Lincoln, NE (United States); Corde, S. [SLAC National Accelerator Lab., Menlo Park, CA (United States); Flacco, A. [ENSTA, CNRS, Ecole Polytechnique, Palaiseau (France); Litos, M. [SLAC National Accelerator Lab., Menlo Park, CA (United States); Neely, D. [Science and Technology Facilities Council (STFC), Oxford (United Kingdom). Rutherford Appleton Lab. (RAL). Central Laser Facility; Viera, J. [Univ. of Lisbon (Portugal). GoLP-Inst. de Plasmas e Fusao Nuclear-Lab. Associado; Najmudin, Z. [Imperial College, London (United Kingdom). Blackett Lab.; Bingham, R. [Science and Technology Facilities Council (STFC), Oxford (United Kingdom). Rutherford Appleton Lab. (RAL). Central Laser Facility; Joshi, C. [Univ. of California, Los Angeles, CA (United States). Dept. of Electrical Engineering; Katsouleas, T. [Duke Univ., Durham, NC (United States). Platt School of Engineering

    2015-01-15

    In this article we review the prospects of laser wakefield accelerators as next generation light sources for applications. This work arose as a result of discussions held at the 2013 Laser Plasma Accelerators Workshop. X-ray phase contrast imaging, X-ray absorption spectroscopy, and nuclear resonance fluorescence are highlighted as potential applications for laser-plasma based light sources. We discuss ongoing and future efforts to improve the properties of radiation from plasma betatron emission and Compton scattering using laser wakefield accelerators for these specific applications.

  10. Salmonella source attribution based on microbial subtyping

    DEFF Research Database (Denmark)

    Barco, Lisa; Barrucci, Federica; Olsen, John Elmerdahl

    2013-01-01

    source attribution models have been implemented by using serotyping and phage-typing data. Molecular-based methods may prove to be similarly valuable in the future, as already demonstrated for other food-borne pathogens like Campylobacter. This review assesses the state of the art concerning Salmonella...... source attribution through microbial subtyping approach. It summarizes the available microbial subtyping attribution models and discusses the use of conventional phenotypic typing methods, as well as of the most commonly applied molecular typing methods in the European Union (EU) laboratories...

  11. Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining

    Science.gov (United States)

    Makimura, Tetsuya; Torii, Shuichi; Okazaki, Kota; Nakamura, Daisuke; Takahashi, Akihiko; Niino, Hiroyuki; Okada, Tatsuo; Murakami, Kouichi

    2011-06-01

    We have investigated responses of PDMS, PMMA and acrylic block copolymers (BCP) to EUV light from laserproduced plasma beyond ablation thresholds and micromachining. We generated wide band EUV light around 100 eV by irradiation of Ta targets with Nd:YAG laser light. In addition, narrow band EUV light at 11 and 13 nm were generated by irradiation of solid Xe and Sn targets, respectively, with pulsed CO2 laser light. The generated EUV light was condensed onto samples, using an ellipsoidal mirror. The EUV light was incident through windows of contact masks on the samples. We found that through-holes with a diameter of 1 μm can be fabricated in PDMS sheets with thicknesses of 10 μm. PDMS sheets are ablated if they are irradiated with EUV light beyond a threshold power density, while PDMS surfaces were modified by irradiation with the narrow band EUV light at lower power densities. Effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals using the practical apparatus. Furthermore, BCP sheets were ablated to have micro-structures. Thus, we have developed a practical technique for microma chining of PMMA, PDMS and BCP sheets in a micrometer scale.

  12. Influence of the solar EUV flux on the Martian plasma environment

    Directory of Open Access Journals (Sweden)

    R. Modolo

    2005-02-01

    Full Text Available The interaction of the solar wind with the Martian atmosphere and ionosphere is investigated by using three-dimensional, global and multi-species hybrid simulations. In the present work we focus on the influence of the solar EUV flux on the Martian plasma environment by comparing simulations done for conditions representative of the extrema of the solar cycle. The dynamics of four ionic species (H+, He++, O+, O2+, originating either from the solar wind or from the planetary plasma, is treated fully kinetically in the simulation model in order to characterize the distribution of each component of the plasma, both at solar maximum and at solar minimum. The solar EUV flux controls the ionization frequencies of the exospheric species, atomic hydrogen and oxygen, as well as the density, the temperature, and thus the extension of the exosphere. Ionization by photons and by electron impacts, and the main charge exchange reactions are self-consistently included in the simulation model. Simulation results are in reasonable agreement with the observations made by Phobos-2 and Mars Global Surveyor (MGS spacecraft: 1 the interaction creates a cavity, void of solar wind ions (H+, He++, which depends weakly upon the phase of the solar cycle, 2 the motional electric field of the solar wind flow creates strong asymmetries in the Martian environment, 3 the spatial distribution of the different components of the planetary plasma depends strongly upon the phase of the solar cycle. The fluxes of the escaping planetary ions are computed from the simulated data and results for solar maximum are compared with estimates based on the measurements made by experiments ASPERA and TAUS on board Phobos-2.

  13. Open Source Web Based Geospatial Processing with OMAR

    Directory of Open Access Journals (Sweden)

    Mark Lucas

    2009-01-01

    Full Text Available The availability of geospatial data sets is exploding. New satellites, aerial platforms, video feeds, global positioning system tagged digital photos, and traditional GIS information are dramatically increasing across the globe. These raw materials need to be dynamically processed, combined and correlated to generate value added information products to answer a wide range of questions. This article provides an overview of OMAR web based geospatial processing. OMAR is part of the Open Source Software Image Map project under the Open Source Geospatial Foundation. The primary contributors of OSSIM make their livings by providing professional services to US Government agencies and programs. OMAR provides one example that open source software solutions are increasingly being deployed in US government agencies. We will also summarize the capabilities of OMAR and its plans for near term development.

  14. Applications of laser wakefield accelerator-based light sources

    Science.gov (United States)

    Albert, Félicie; Thomas, Alec G. R.

    2016-11-01

    Laser-wakefield accelerators (LWFAs) were proposed more than three decades ago, and while they promise to deliver compact, high energy particle accelerators, they will also provide the scientific community with novel light sources. In a LWFA, where an intense laser pulse focused onto a plasma forms an electromagnetic wave in its wake, electrons can be trapped and are now routinely accelerated to GeV energies. From terahertz radiation to gamma-rays, this article reviews light sources from relativistic electrons produced by LWFAs, and discusses their potential applications. Betatron motion, Compton scattering and undulators respectively produce x-rays or gamma-rays by oscillating relativistic electrons in the wakefield behind the laser pulse, a counter-propagating laser field, or a magnetic undulator. Other LWFA-based light sources include bremsstrahlung and terahertz radiation. We first evaluate the performance of each of these light sources, and compare them with more conventional approaches, including radio frequency accelerators or other laser-driven sources. We have then identified applications, which we discuss in details, in a broad range of fields: medical and biological applications, military, defense and industrial applications, and condensed matter and high energy density science.

  15. Accelerator-based photoneutron source for BNCT applications

    Energy Technology Data Exchange (ETDEWEB)

    Jones, J.L. [Idaho National Engineering Lab., Idaho Falls, ID (United States)

    1994-12-31

    An alternate approach for the potential realization of a clinically-applicable, accelerator-based source of epithermal neutrons for Boron Neutron Capture Therapy (BNCT) is described. The approach uses a compact photoneutron source and a beam filtering/moderation volume for the production of BNCT-applicable neutrons. The photoneutron source consists of a small, heavy water-filled, cylindrical tungsten tank and multiple, inwardly-directed beams of 5-8 MeV electrons. Up to 50 percent (by volume) of the tank may include beryllium. The heavy water serves as both the neutron source and the assembly coolant function. The energetic electrons interacting in the tungsten tank wall generate highly penetrating, multiple source bremsstrahlung radiation. Subsequently, photoneutrons are produced in the tank volume. These resulting photoneutrons are then moderated in a specialized filter/moderator region located around the central tank. The concept also includes a bismuth-lead gamma shield and a lithiated-polyethylene neutron beam delimiter. In support of this approach, this paper will include experimental results using a low-current, benchtop system and an energy-selectable linear electron accelerator. The results will be compared to numerical predictions, and system requirements for clinical-applications are identified.

  16. Source distance determination based on the spherical harmonics

    Science.gov (United States)

    Koutny, Adam; Jiricek, Ondrej; Thomas, Jean-Hugh; Brothanek, Marek

    2017-02-01

    This paper deals with the processing of signals measured by a spherical microphone array, focusing on the utilization of near-field information of such an array. The processing, based on the spherical harmonics decomposition, is performed in order to investigate the radial-dependent spherical functions and extract their argument - distance to the source. Using the low-frequency approximation of these functions, the source distance is explicitly expressed. The source distance is also determined from the original equation (using no approximation) by comparing both sides of this equation. The applicability of both methods is first presented in the noise-less data simulation, then validated with data contaminated by the additive white noise of different signal-to-noise ratios. Finally, both methods are tested for real data measured by a rigid spherical microphone array of radius 0.15 m, consisting of 36 microphones for a point source represented by a small speaker. The possibility of determination of the source distance using low-order spherical harmonics is shown.

  17. Visual color matching system based on RGB LED light source

    Science.gov (United States)

    Sun, Lei; Huang, Qingmei; Feng, Chen; Li, Wei; Wang, Chaofeng

    2018-01-01

    In order to study the property and performance of LED as RGB primary color light sources on color mixture in visual psychophysical experiments, and to find out the difference between LED light source and traditional light source, a visual color matching experiment system based on LED light sources as RGB primary colors has been built. By simulating traditional experiment of metameric color matching in CIE 1931 RGB color system, it can be used for visual color matching experiments to obtain a set of the spectral tristimulus values which we often call color-matching functions (CMFs). This system consists of three parts: a monochromatic light part using blazed grating, a light mixing part where the summation of 3 LED illuminations are to be visually matched with a monochromatic illumination, and a visual observation part. The three narrow band LEDs used have dominant wavelengths of 640 nm (red), 522 nm (green) and 458 nm (blue) respectively and their intensities can be controlled independently. After the calibration of wavelength and luminance of LED sources with a spectrophotometer, a series of visual color matching experiments have been carried out by 5 observers. The results are compared with those from CIE 1931 RGB color system, and have been used to compute an average locus for the spectral colors in the color triangle, with white at the center. It has been shown that the use of LED is feasible and has the advantages of easy control, good stability and low cost.

  18. Source-Based Tasks in Writing Independent and Integrated Essays

    Directory of Open Access Journals (Sweden)

    Javad Gholami

    2017-07-01

    Full Text Available Integrated writing tasks have gained considerable attention in ESL and EFL writing assessment and are frequently needed and used in academic settings and daily life. However, they are very rarely practiced and promoted in writing classes. This paper explored the effects of source-based writing practice on EFL learners’ composing abilities and investigated the probable differences between those tasks and independent writing ones in improving Iranian EFL learners’ essay writing abilities. To this end, a quasi-experimental design was implemented to gauge EFL learners’ writing improvements using a pretest-posttest layout. Twenty female learners taking a TOEFL iBT preparation course were randomly divided into an only-writing group with just independent writing instruction and essay practice, and a hybrid-writing-approach group receiving instruction and practice on independent writing plus source-based essay writing for ten sessions. Based on the findings, the participants with hybrid writing practice outperformed their counterparts in integrated essay tests. Their superior performance was not observed in the case of traditional independent writing tasks. The present study calls for incorporating more source-based writing tasks in writing courses.

  19. Using aberration test patterns to optimize the performance of EUV aerial imaging microscopes

    Energy Technology Data Exchange (ETDEWEB)

    Mochi, Iacopo; Goldberg, Kenneth A.; Miyakawa, Ryan; Naulleau, Patrick; Han, Hak-Seung; Huh, Sungmin

    2009-06-16

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a prototype EUV-wavelength zoneplate microscope that provides high quality aerial image measurements of EUV reticles. To simplify and improve the alignment procedure we have created and tested arrays of aberration-sensitive patterns on EUV reticles and we have compared their images collected with the AIT to the expected shapes obtained by simulating the theoretical wavefront of the system. We obtained a consistent measure of coma and astigmatism in the center of the field of view using two different patterns, revealing a misalignment condition in the optics.

  20. Laser-produced plasma source system development

    Science.gov (United States)

    Fomenkov, Igor V.; Brandt, David C.; Bykanov, Alexander N.; Ershov, Alexander I.; Partlo, William N.; Myers, David W.; Böwering, Norbert R.; Vaschenko, Georgiy O.; Khodykin, Oleh V.; Hoffman, Jerzy R.; Vargas L., Ernesto; Simmons, Rodney D.; Chavez, Juan A.; Chrobak, Christopher P.

    2007-03-01

    This paper describes the development of laser produced plasma (LPP) technology as an EUV source for advanced scanner lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193 nm immersion technology for critical layer patterning below 32 nm beginning with beta generation scanners in 2009. This paper describes the development status of subsystems most critical to the performance to meet joint scanner manufacturer requirements and semiconductor industry standards for reliability and economic targets for cost of ownership. The intensity and power of the drive laser are critical parameters in the development of extreme ultraviolet LPP lithography sources. The conversion efficiency (CE) of laser light into EUV light is strongly dependent on the intensity of the laser energy on the target material at the point of interaction. The total EUV light generated then scales directly with the total incident laser power. The progress on the development of a short pulse, high power CO2 laser for EUV applications is reported. The lifetime of the collector mirror is a critical parameter in the development of extreme ultra-violet LPP lithography sources. The deposition of target materials and contaminants, as well as sputtering of the collector multilayer coating and implantation of incident particles can reduce the reflectivity of the mirror substantially over the exposure time even though debris mitigation schemes are being employed. The results of measurements of high energy ions generated by a short-pulse CO2 laser on a laser-produced plasma EUV light source with Sn target are presented. Droplet generation is a key element of the LPP source being developed at Cymer for EUV lithography applications. The main purpose of this device is to deliver small quantities of liquid target material as droplets to the laser focus. The EUV light in such configuration is obtained as a result of creating a highly ionized plasma from the material of the

  1. Fizeau simultaneous phase-shifting interferometry based on extended source

    Science.gov (United States)

    Wang, Shanshan; Zhu, Qiudong; Hou, Yinlong; Cao, Zheng

    2016-09-01

    Coaxial Fizeau simultaneous phase-shifting interferometer plays an important role in many fields for its characteristics of long optical path, miniaturization, and elimination of reference surface high-frequency error. Based on the matching of coherence between extended source and interferometer, orthogonal polarization reference wave and measurement wave can be obtained by Fizeau interferometry with Michelson interferometer preposed. Through matching spatial coherence length between preposed interferometer and primary interferometer, high contrast interference fringes can be obtained and additional interference fringes can be eliminated. Thus, the problem of separation of measurement and reference surface in the common optical path Fizeau interferometer is solved. Numerical simulation and principle experiment is conducted to verify the feasibility of extended source interferometer. Simulation platform is established by using the communication technique of DDE (dynamic data exchange) to connect Zemax and Matlab. The modeling of the extended source interferometer is realized by using Zemax. Matlab codes are programmed to automatically rectify the field parameters of the optical system and conveniently calculate the visibility of interference fringes. Combined with the simulation, the experimental platform of the extended source interferometer is established. After experimental research on the influence law of scattering screen granularity to interference fringes, the granularity of scattering screen is determined. Based on the simulation platform and experimental platform, the impacts on phase measurement accuracy of the imaging system aberration and collimation system aberration of the interferometer are analyzed. Compared the visibility relation curves between experimental measurement and simulation result, the experimental result is in line with the theoretical result.

  2. Visible and ultraviolet light sources based nonlinear interaction of lasers

    DEFF Research Database (Denmark)

    Andersen, Martin Thalbitzer; Tidemand-Lichtenberg, Peter; Jain, Mayank

    Different light sources can be used for optically stimulated luminescence measurements and usually a halogen lamp in combination with filters or light emitting diodes (LED’s) are used to provide the desired stimulation wavelength. However lasers can provide a much more well-defined beam, very...... for synthesizing any wavelength in the visible and ultraviolet light based sum frequency generation between two lasers is presented....

  3. Off-limb EUV observations of the solar corona and transients with the CORONAS-F/SPIRIT telescope-coronagraph

    Directory of Open Access Journals (Sweden)

    V. Slemzin

    2008-10-01

    Full Text Available The SPIRIT telescope aboard the CORONAS-F satellite (in orbit from 26 July 2001 to 5 December 2005, observed the off-limb solar corona in the 175 Å (Fe IX, X and XI lines and 304 Å (He II and Si XI lines bands. In the coronagraphic mode the mirror was tilted to image the corona at the distance of 1.1...5 Rsun from the solar center, the outer occulter blocked the disk radiation and the detector sensitivity was enhanced. This intermediate region between the fields of view of ordinary extreme-ultraviolet (EUV telescopes and most of the white-light (WL coronagraphs is responsible for forming the streamer belt, acceleration of ejected matter and emergence of slow and fast solar wind. We present here the results of continuous coronagraphic EUV observations of the solar corona carried out during two weeks in June and December 2002. The images showed a "diffuse" (unresolved component of the corona seen in both bands, and non-radial, ray-like structures seen only in the 175 Å band, which can be associated with a streamer base. The correlations between latitudinal distributions of the EUV brightness in the corona and at the limb were found to be high in 304 Å at all distances and in 175 Å only below 1.5 Rsun. The temporal correlation of the coronal brightness along the west radial line, with the brightness at the underlying limb region was significant in both bands, independent of the distance. On 2 February 2003 SPIRIT observed an expansion of a transient associated with a prominence eruption seen only in the 304 Å band. The SPIRIT data have been compared with the corresponding data of the SOHO LASCO, EIT and UVCS instruments.

  4. Off-limb EUV observations of the solar corona and transients with the CORONAS-F/SPIRIT telescope-coronagraph

    Directory of Open Access Journals (Sweden)

    V. Slemzin

    2008-10-01

    Full Text Available The SPIRIT telescope aboard the CORONAS-F satellite (in orbit from 26 July 2001 to 5 December 2005, observed the off-limb solar corona in the 175 Å (Fe IX, X and XI lines and 304 Å (He II and Si XI lines bands. In the coronagraphic mode the mirror was tilted to image the corona at the distance of 1.1...5 Rsun from the solar center, the outer occulter blocked the disk radiation and the detector sensitivity was enhanced. This intermediate region between the fields of view of ordinary extreme-ultraviolet (EUV telescopes and most of the white-light (WL coronagraphs is responsible for forming the streamer belt, acceleration of ejected matter and emergence of slow and fast solar wind. We present here the results of continuous coronagraphic EUV observations of the solar corona carried out during two weeks in June and December 2002. The images showed a "diffuse" (unresolved component of the corona seen in both bands, and non-radial, ray-like structures seen only in the 175 Å band, which can be associated with a streamer base. The correlations between latitudinal distributions of the EUV brightness in the corona and at the limb were found to be high in 304 Å at all distances and in 175 Å only below 1.5 Rsun. The temporal correlation of the coronal brightness along the west radial line, with the brightness at the underlying limb region was significant in both bands, independent of the distance. On 2 February 2003 SPIRIT observed an expansion of a transient associated with a prominence eruption seen only in the 304 Å band. The SPIRIT data have been compared with the corresponding data of the SOHO LASCO, EIT and UVCS instruments.

  5. Optical constants of materials in the EUV/soft x-ray region for multilayer mirror applications

    Energy Technology Data Exchange (ETDEWEB)

    Soufli, Regina [Univ. of California, Berkeley, CA (United States)

    1997-12-01

    The response of a given material to an incident electromagnetic wave is described by the energy dependent complex index of refraction n = 1 - δ + iβ. In the extreme ultraviolet (EUV)/soft x-ray spectral region, the need for accurate determination of n is driven by activity in areas such as synchrotron based research, EUV/x-ray lithography, x-ray astronomy and plasma applications. Knowledge of the refractive index is essential for the design of the optical components of instruments used in experiments and applications. Moreover, measured values of n may be used to evaluate solid state models for the optical behavior of materials. The refractive index n of Si, Mo and Be is investigated in the EUV/soft x-ray region. In the case of Si, angle dependent reflectance measurements are performed in the energy range 50-180 eV. The optical constants δ, β are both determined by fitting to the Fresnel equations. The results of this method are compared to the values in the 1993 atomic tables. Photoabsorption measurements for the optical constants of Mo are performed on C/Mo/C foils, in the energy range 60-930 eV. Photoabsorption measurements on Be thin films supported on silicon nitride membranes are performed, and the results are applied in the determination of the absorption coefficient of Be in the energy region 111.5-250 eV. The new results for Si and Mo are applied to the calculation of normal incidence reflectivities of Mo/Si and Mo/Be multilayer mirrors. These calculations show the importance of accurate knowledge of δ and β in the prediction and modeling of the performance of multilayer optics.

  6. Etch bias inversion during EUV mask ARC etch

    Science.gov (United States)

    Lajn, Alexander; Rolff, Haiko; Wistrom, Richard

    2017-07-01

    The introduction of EUV lithography to high volume manufacturing is now within reach for 7nm technology node and beyond (1), at least for some steps. The scheduling is in transition from long to mid-term. Thus, all contributors need to focus their efforts on the production requirements. For the photo mask industry, these requirements include the control of defectivity, CD performance and lifetime of their masks. The mask CD performance including CD uniformity, CD targeting, and CD linearity/ resolution, is predominantly determined by the photo resist performance and by the litho and etch processes. State-of-the-art chemically amplified resists exhibit an asymmetric resolution for directly and indirectly written features, which usually results in a similarly asymmetric resolution performance on the mask. This resolution gap may reach as high as multiple tens of nanometers on the mask level in dependence of the chosen processes. Depending on the printing requirements of the wafer process, a reduction or even an increase of this gap may be required. A potential way of tuning via the etch process, is to control the lateral CD contribution during etch. Aside from process tuning knobs like pressure, RF powers and gases, which usually also affect CD linearity and CD uniformity, the simplest knob is the etch time itself. An increased over etch time results in an increased CD contribution in the normal case. , We found that the etch CD contribution of ARC layer etch on EUV photo masks is reduced by longer over etch times. Moreover, this effect can be demonstrated to be present for different etch chambers and photo resists.

  7. Investigation of alternate mask absorbers in EUV lithography

    Science.gov (United States)

    Burkhardt, Martin

    2017-03-01

    In order to succeed with such low-k1 lithography at EUV wavelength, we need to be able to print a grating at high contrast similar to ArF immersion tools, where a contrast exceeding 0.95 is achieved routinely. All 2d printing is composed of interference of x and y-directed diffraction orders and high contrast in 2d thus depends on such 1d grating contrast. Any low-k1 imaging will use either dipole or some other sort of extreme off-axis illumination such as cross-quad (cQuad). The two relevant magnitudes for any high contrast are the intrinsic contrast due to a monopole, and the spatial shift of the two images that are generated by the two monopoles making up the dipole exposure. In EUV with current absorbers, high contrast can currently only be achieved using monopole illumination, a technique that does not lend itself to process integration due to removal of wafer side telecentricity and resulting overlay problems at all but preferred pitch. For dipole illumination at low-k1 pitches, we collect only 0th order light and only one 1st diffracted order for each pole. This means that for a dipole at the resolution limit, the final image for horizontal l/s patterns consists of only four incident waves, one TE and one TM wave for each of the poles. In this paper, we screen absorber by n and k values. In the process, we introduce phasor notation in order to gain insight into the behavior of the absorber and try to understand the metrics. We investigate intrinsic contrast and image blur due to monopole image shift.

  8. Laboratory Calibration of Density-Dependent Lines in the EUV and Soft X-Ray Regions

    Energy Technology Data Exchange (ETDEWEB)

    Lepson, J K; Beiersdorfer, P; Gu, M F; Desai, P

    2010-12-09

    We analyzed spectral data of Fe XXII and Ar XIV from laboratory sources in which the electron density varies by several orders of magnitude to help benchmark density-sensitive emission lines useful for astrophysics and to test the atomic models underlying the diagnostic line ratios. We found excellent agreement for Fe XXII, but poorer agreement for Ar XIV. A number of astrophysically important emission lines are sensitive to electron density in the EUV and soft X-ray regions. Lines from Fe XXII, for example, have been used in recent years as diagnostics of stellar coronae, such as the active variable AB Dor, Capella, and EX Hya (Sanz-Forcada et al. 2003, Mewe et al. 2001, Mauche et al. 2003). Here we report spectral data of Fe XXII and Ar XIV from laboratory sources in which the electron density is known from either K-shell density diagnostics (for electron beam ion traps) or from non-spectroscopic means (tokamaks), ranging from 5 x 10{sup 10} cm{sup -3} to 5 x 10{sup 14} cm{sup -3}. These measurements were used to test the atomic data underlying the density diagnostic line ratios, complementing earlier work (Chen et al. 2004).

  9. Laser produced plasma for efficient extreme ultraviolet light sources

    Energy Technology Data Exchange (ETDEWEB)

    Donnelly, Tony; Cummins, Thomas; O' Gorman, Colm; Li Bowen; Harte, Colm S.; O' Reilly, Fergal; Sokell, Emma; Dunne, Padraig; O' Sullivan, Gerry [School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland)

    2012-05-25

    Extreme ultraviolet emission from laser produced plasma and their relevance to EUV source development is discussed. The current state of the field for Sn LPP sources operating at 13.5 nm is described and initial results are given for EUV emission from CO{sub 2} laser irradiation of a bulk Sn target. A maximum conversion efficiency of 1.7% has been measured and the influence of the CO{sub 2} laser temporal profile on the CE is discussed. A double pulse irradiation scheme is shown to increase CE up to a maximum value of 2.1% for an optimum prepulse - pulse delay of 150 ns. The emergence of a new EUVL source wavelength at 6.7 nm based on Gd and Tb LPPs has been outlined. An initial experiment investigating picosecond laser irradiation as a means to produce strong 6.7 nm emission from a Gd{sub 2}O{sub 3} target has been performed and verified.

  10. Writable electrochemical energy source based on graphene oxide

    Science.gov (United States)

    Wei, Di

    2015-10-01

    Graphene oxide (GO) was mainly used as raw material for various types of reduced graphene oxide (rGO) as a cost effective method to make graphene like materials. However, applications of its own unique properties such as extraordinary proton conductivity and super-permeability to water were overlooked. Here GO based battery-like planar energy source was demonstrated on arbitrary insulating substrate (e.g. polymer sheet/paper) by coating PEDOT, GO ink and rGO on Ag charge collectors. Energy from such GO battery depends on its length and one unit cell with length of 0.5 cm can generate energy capacity of 30 Ah/L with voltage up to 0.7 V when room temperature ionic liquid (RTIL) is added. With power density up to 0.4 W/cm3 and energy density of 4 Wh/L, GO battery was demonstrated to drive an electrochromic device. This work is the first attempt to generate decent energy using the fast transported water molecules inside GO. It provides very safe energy source that enables new applications otherwise traditional battery technology can not make including building a foldable energy source on paper and platform for futuristic wearable electronics. A disposable energy source made of GO was also written on a plastic glove to demonstrate wearability.

  11. EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

    Science.gov (United States)

    Putna, E. Steve; Younkin, Todd R.; Chandhok, Manish; Frasure, Kent

    2009-03-01

    The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 32nm half-pitch node and beyond. Readiness of EUV materials is currently one high risk area according to assessments made at the 2008 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data is presented utilizing Intel's Micro-Exposure Tool (MET) examining the feasibility of establishing a resist process that simultaneously exhibits <=30nm half-pitch (HP) L/S resolution at <=10mJ/cm2 with <=4nm LWR.

  12. The Variability and Spectrum of NGC 4051 from Deep, Simultaneous EUVE and XTE Observations

    Science.gov (United States)

    Fruscione, Antonella; Cagnoni, Ilaria; Papadakis, Iossif; McHardy, Ian

    1998-01-01

    We present timing and spectral analysis of the data collected by the Extreme Ultraviolet Explorer Satellite (EUVE) for the Seyfert 1 galaxy NGC 4051 during 1996. NGC 4051 was observed twice in May 1996 and again in December 1996 for a total of more than 200 ksec. The observations were always simultaneous with hard X-ray observations conducted with the X-Ray Timing Explorer (XTE). The EUVE light curves are extremely variable during each observation, with the maximum variability during May 1996 when we registered changes by a factor of 21 over 8 hours and more than a factor of 24 variations from peak to minimum. We detected signal in the EUVE spectrograph in the 75-100 Arange which is well fitted by absorbed power law models. We will illustrate the results of our spectral and detailed power spectrum analysis for the simultaneous EUVE and XTE spectra and light curves and discuss the consequences on possible emission mechanisms.

  13. PVO VENUS ELECT TMP PROBE RESAMP SOLAR EUV 24 HR AVG VER 1.0

    Data.gov (United States)

    National Aeronautics and Space Administration — The Solar EUV Daily Values File. This file gives the magnitude of the photoemission current from the radial probe, Ipe, (in units of 10-9 amps). Ipe dominates the...

  14. Hemispherical Nature of EUV Shocks Revealed by SOHO, STEREO, and SDO Observations

    Science.gov (United States)

    Gopalswamy, Natchimuthuk; Nitta, N.; Akiyama, S.; Makela, P.; Yashiro, S.

    2011-01-01

    EUV wave transients associated with type II radio bursts are manifestation of CME-driven shocks in the solar corona. We use recent EUV wave observations from SOHO, STEREO, and SDO for a set of CMEs to show that the EUV transients have a spherical shape in the inner corona. We demonstrate this by showing that the radius of the EUV transient on the disk observed by one instrument is approximately equal to the height of the wave above the solar surface in an orthogonal view provided by another instrument. The study also shows that the CME-driven shocks often form very low in the corona at a heliocentric distance of 1.2 Rs, even smaller than the previous estimates from STEREO/CORl data (Gopalswamy et aI., 2009, Solar Phys. 259, 227). These results have important implications for the acceleration of solar energetic particles by CMEs

  15. Photoelectron scattering and acid release in EUV lithography: a simulation study (Conference Presentation)

    Science.gov (United States)

    Biafore, John J.

    2017-03-01

    Abstract BACKGROUND: The ionizing wavelength in extreme ultraviolet (EUV) resist exposure leads to photoelectron scattering and uncertainty in the resulting acid image, producing line-edge roughness (LER) and poor CD uniformity of the printed features. GOALS: Try to determine how photoelectron and acid exposure blur effects affect EUV lithography and how they might be better controlled. Try to determine whether or not, and if so under what conditions, high resist quantum yields are beneficial to EUV lithography. METHODS: Using a stochastic resist simulator, we study the effects of resist properties upon photoelectric scattering, the uncertainty in the acid release and the properties of the after-development photoresist image in high NA EUV lithography. Uncertainty in the release of acids is the fundamental cause of LER and the ultimate limiter of optical lithography technology.

  16. Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

    KAUST Repository

    Kryask, Marie

    2013-01-01

    Hybrid nanoparticle photoresists and their patterning using DUV, EUV, 193 nm lithography and e-beam lithography has been investigated and reported earlier. The nanoparticles have demonstrated very high EUV sensitivity and significant etch resistance compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass loss and dissolution studies support the current model. © 2013SPST.

  17. Waveguide-based OPO source of entangled photon pairs

    Energy Technology Data Exchange (ETDEWEB)

    Pomarico, Enrico; Sanguinetti, Bruno; Gisin, Nicolas; Thew, Robert; Zbinden, Hugo [Group of Applied Physics, University of Geneva, 1211 Geneva (Switzerland); Schreiber, Gerhard; Thomas, Abu; Sohler, Wolfgang [Angewandte Physik, University of Paderborn, 33095 Paderborn (Germany)], E-mail: enrico.pomarico@unige.ch

    2009-11-15

    In this paper, we present a compact source of narrow-band energy-time-entangled photon pairs in the telecom regime based on a Ti-indiffused periodically poled lithium niobate (PPLN) waveguide resonator, i.e. a waveguide with end-face dielectric multi-layer mirrors. This is a monolithic doubly resonant optical parametric oscillator (OPO) far below threshold, which generates photon pairs by spontaneous parametric down-conversion (SPDC) at around 1560 nm with a 117 MHz (0.91 pm)-bandwidth. A coherence time of 2.7 ns is estimated by a time correlation measurement and a high quality of the entangled states is confirmed by a Bell-type experiment. Since highly coherent energy-time-entangled photon pairs in the telecom regime are suitable for long distance transmission and manipulation, this source is well suited to the requirements of quantum communication.

  18. Development open source microcontroller based temperature data logger

    Science.gov (United States)

    Abdullah, M. H.; Che Ghani, S. A.; Zaulkafilai, Z.; Tajuddin, S. N.

    2017-10-01

    This article discusses the development stages in designing, prototyping, testing and deploying a portable open source microcontroller based temperature data logger for use in rough industrial environment. The 5V powered prototype of data logger is equipped with open source Arduino microcontroller for integrating multiple thermocouple sensors with their module, secure digital (SD) card storage, liquid crystal display (LCD), real time clock and electronic enclosure made of acrylic. The program for the function of the datalogger is programmed so that 8 readings from the thermocouples can be acquired within 3 s interval and displayed on the LCD simultaneously. The recorded temperature readings at four different points on both hydrodistillation show similar profile pattern and highest yield of extracted oil was achieved on hydrodistillation 2 at 0.004%. From the obtained results, this study achieved the objective of developing an inexpensive, portable and robust eight channels temperature measuring module with capabilities to monitor and store real time data.

  19. A time dependent relation between EUV solar flare light-curves from lines with differing formation temperatures

    Directory of Open Access Journals (Sweden)

    Thiemann Edward M.B.

    2017-01-01

    Full Text Available Extreme ultraviolet (EUV solar flare emissions evolve in time as the emitting plasma heats and then cools. Although accurately modeling this evolution has been historically difficult, especially for empirical relationships, it is important for understanding processes at the Sun, as well as for their influence on planetary atmospheres. With a goal to improve empirical flare models, a new simple empirical expression is derived to predict how cool emissions evolve based on the evolution of a hotter emission. This technique is initially developed by studying 12 flares in detail observed by the EUV variability experiment (EVE onboard the Solar Dynamics Observatory (SDO. Then, over 1100 flares observed by EVE are analyzed to validate these relationships. The Cargill and Enthalpy Based Thermal Evolution of Loops (EBTEL flare cooling models are used to show that this empirical relationship implies the energy radiated by a population of hotter formed ions is approximately proportional to the energy exciting a population of cooler formed ions emitting when the peak formation temperatures of the two lines are up to 72% of each other and above 2 MK. These results have practical implications for improving flare irradiance empirical modeling and for identifying key emission lines for future monitoring of flares for space weather operations; and also provide insight into the cooling processes of flare plasma.

  20. Developing seismogenic source models based on geologic fault data

    Science.gov (United States)

    Haller, Kathleen M.; Basili, Roberto

    2011-01-01

    Calculating seismic hazard usually requires input that includes seismicity associated with known faults, historical earthquake catalogs, geodesy, and models of ground shaking. This paper will address the input generally derived from geologic studies that augment the short historical catalog to predict ground shaking at time scales of tens, hundreds, or thousands of years (e.g., SSHAC 1997). A seismogenic source model, terminology we adopt here for a fault source model, includes explicit three-dimensional faults deemed capable of generating ground motions of engineering significance within a specified time frame of interest. In tectonically active regions of the world, such as near plate boundaries, multiple seismic cycles span a few hundred to a few thousand years. In contrast, in less active regions hundreds of kilometers from the nearest plate boundary, seismic cycles generally are thousands to tens of thousands of years long. Therefore, one should include sources having both longer recurrence intervals and possibly older times of most recent rupture in less active regions of the world rather than restricting the model to include only Holocene faults (i.e., those with evidence of large-magnitude earthquakes in the past 11,500 years) as is the practice in tectonically active regions with high deformation rates. During the past 15 years, our institutions independently developed databases to characterize seismogenic sources based on geologic data at a national scale. Our goal here is to compare the content of these two publicly available seismogenic source models compiled for the primary purpose of supporting seismic hazard calculations by the Istituto Nazionale di Geofisica e Vulcanologia (INGV) and the U.S. Geological Survey (USGS); hereinafter we refer to the two seismogenic source models as INGV and USGS, respectively. This comparison is timely because new initiatives are emerging to characterize seismogenic sources at the continental scale (e.g., SHARE in the

  1. Cooling Load Estimation in the Building Based On Heat Sources

    Science.gov (United States)

    Chairani; Sulistyo, S.; Widyawan

    2017-05-01

    Heating, ventilation and air conditioning (HVAC) is the largest source of energy consumption. In this research, we discuss cooling load in the room by considering the different heat source and the number of occupancy. Energy cooling load is affected by external and internal heat sources. External cooling load in this discussion include convection outdoor/exterior using the DOE-2 algorithm, calculation of heat using Thermal Analysis Research Program (TARP), and Conduction Transfer Function (CTF). The internal cooling load is calculated based on the activity of the occupants in the office, a number of occupants, heat gain from lighting, and heat gain from electrics equipment. Weather data used is Surakarta weather and design day used is Jakarta design day. We use the ASHRAE standard for building materials and the metabolic of occupants while on the activity. The results show that the number of occupancies have an influence of cooling load. A large number of occupancy will cause the cooling load is great as well.

  2. A preliminary study on the correlation between high-frequency infrasound recordings and source location based on multiple source recordings.

    Science.gov (United States)

    Seo, M.

    2016-12-01

    The infrasound recordings are correlated by source location distance and velocity structure of the atmosphere and recording instruments. On the Korean peninsula, dense Infrasound recording station was installed for nearby the demilitarized border between north and south by latitudinal direction. For the multiple purpose manipulation of the infrasound recording station, the high and low frequency was focused for the near source and regional source. The recordings are ruled by the infrasound transfer model based on atmosphere model based on the source-location distance. A preliminary study for the recordings nearby the military border and East Sea border and West Sea border and Je-Ju Island of the Korean peninsula was focused on high frequency infrasound noise decay correlation study with distinct source. The minimum high frequency recording distance was proposed for the very near source in source-location distance on the Korean peninsula.

  3. Single-photon source based on Rydberg exciton blockade

    Science.gov (United States)

    Khazali, Mohammadsadegh; Heshami, Khabat; Simon, Christoph

    2017-11-01

    Bound states of electron–hole pairs in semiconductors demonstrate a hydrogen-like behavior in their high-lying excited states that are also known as Rydberg exciton states. The strong interaction between excitons in levels with high principal quantum numbers prevents the creation of more than one exciton in a small crystal; resulting in the Rydberg blockade effect. Here, we propose a new kind of solid-state single-photon source based on the recently observed Rydberg blockade effect for excitons in cuprous oxide. Our quantitative estimates based on single and double excitation probability dynamics indicate that GHz rates and values of the second-order correlation function {g}2(0) below the percent level can be simultaneously achievable. These results should pave the way to explore applications of Rydberg excitons in photonic quantum information processing.

  4. FPGA-Based Instrumentation for the Fermilab Antiproton Source

    CERN Document Server

    Ashmanskas, Bill; Kiper, Terry; Peterson, David

    2005-01-01

    We have designed and built low-cost, low-power, ethernet-based circuit boards to apply DSP techniques to several instrumentation upgrades in the Fermilab Antiproton Source. Commodity integrated circuits such as direct digital synthesizers, D/A and A/D converters, and quadrature demodulators enable digital manipulation of RF waveforms. A low cost FPGA implements a variety of signal processing algorithms in a manner that is easily adapted to new applications. An embedded microcontroller provides FPGA configuration, control of data acquisition, and command-line interface. A small commercial daughter board provides an ethernet-based TCP/IP interface between the microcontroller and the Fermilab accelerator control network. The board is packaged as a standard NIM module. Applications include Low Level RF control for the Debuncher, readout of transfer-line Beam Position Monitors, and narrow-band spectral analysis of diagnostic signals from Schottky pickups.

  5. Error Sources in Proccessing LIDAR Based Bridge Inspection

    Science.gov (United States)

    Bian, H.; Chen, S. E.; Liu, W.

    2017-09-01

    Bridge inspection is a critical task in infrastructure management and is facing unprecedented challenges after a series of bridge failures. The prevailing visual inspection was insufficient in providing reliable and quantitative bridge information although a systematic quality management framework was built to ensure visual bridge inspection data quality to minimize errors during the inspection process. The LiDAR based remote sensing is recommended as an effective tool in overcoming some of the disadvantages of visual inspection. In order to evaluate the potential of applying this technology in bridge inspection, some of the error sources in LiDAR based bridge inspection are analysed. The scanning angle variance in field data collection and the different algorithm design in scanning data processing are the found factors that will introduce errors into inspection results. Besides studying the errors sources, advanced considerations should be placed on improving the inspection data quality, and statistical analysis might be employed to evaluate inspection operation process that contains a series of uncertain factors in the future. Overall, the development of a reliable bridge inspection system requires not only the improvement of data processing algorithms, but also systematic considerations to mitigate possible errors in the entire inspection workflow. If LiDAR or some other technology can be accepted as a supplement for visual inspection, the current quality management framework will be modified or redesigned, and this would be as urgent as the refine of inspection techniques.

  6. ERROR SOURCES IN PROCCESSING LIDAR BASED BRIDGE INSPECTION

    Directory of Open Access Journals (Sweden)

    H. Bian

    2017-09-01

    Full Text Available Bridge inspection is a critical task in infrastructure management and is facing unprecedented challenges after a series of bridge failures. The prevailing visual inspection was insufficient in providing reliable and quantitative bridge information although a systematic quality management framework was built to ensure visual bridge inspection data quality to minimize errors during the inspection process. The LiDAR based remote sensing is recommended as an effective tool in overcoming some of the disadvantages of visual inspection. In order to evaluate the potential of applying this technology in bridge inspection, some of the error sources in LiDAR based bridge inspection are analysed. The scanning angle variance in field data collection and the different algorithm design in scanning data processing are the found factors that will introduce errors into inspection results. Besides studying the errors sources, advanced considerations should be placed on improving the inspection data quality, and statistical analysis might be employed to evaluate inspection operation process that contains a series of uncertain factors in the future. Overall, the development of a reliable bridge inspection system requires not only the improvement of data processing algorithms, but also systematic considerations to mitigate possible errors in the entire inspection workflow. If LiDAR or some other technology can be accepted as a supplement for visual inspection, the current quality management framework will be modified or redesigned, and this would be as urgent as the refine of inspection techniques.

  7. Future Synchrotron Light Sources Based on Ultimate Storage Rings

    Energy Technology Data Exchange (ETDEWEB)

    Cai, Yunhai; /SLAC

    2012-04-09

    The main purpose of this talk is to describe how far one might push the state of the art in storage ring design. The talk will start with an overview of the latest developments and advances in the design of synchrotron light sources based on the concept of an 'ultimate' storage ring. The review will establish how bright a ring based light source might be, where the frontier of technological challenges are, and what the limits of accelerator physics are. Emphasis will be given to possible improvements in accelerator design and developments in technology toward the goal of achieving an ultimate storage ring. An ultimate storage ring (USR), defined as an electron ring-based light source having an emittance in both transverse planes at the diffraction limit for the range of X-ray wavelengths of interest for a scientific community, would provide very high brightness photons having high transverse coherence that would extend the capabilities of X-ray imaging and probe techniques beyond today's performance. It would be a cost-effective, high-coherence 4th generation light source, competitive with one based on energy recovery linac (ERL) technology, serving a large number of users studying material, chemical, and biological sciences. Furthermore, because of the experience accumulated over many decades of ring operation, it would have the great advantage of stability and reliability. In this paper we consider the design of an USR having 10-pm-rad emittance. It is a tremendous challenge to design a storage ring having such an extremely low emittance, a factor of 100 smaller than those in existing light sources, especially such that it has adequate dynamic aperture and beam lifetime. In many ultra-low emittance designs, the injection acceptances are not large enough for accumulation of the electron beam, necessitating on-axis injection where stored electron bunches are completely replaced with newly injected ones. Recently, starting with the MAX-IV 7-bend

  8. Coronary revascularization treatment based on dual-source computed tomography

    Energy Technology Data Exchange (ETDEWEB)

    Dikkers, R.; Willems, T.P.; Jonge, G.J. de; Zaag-Loonen, H.J. van der; Ooijen, P.M.A. van; Oudkerk, M. [University of Groningen, Department of Radiology, Groningen (Netherlands); University Medical Center, Groningen (Netherlands); Piers, L.H.; Tio, R.A.; Zijlstra, F. [University of Groningen, Department of Cardiology, Groningen (Netherlands); University Medical Center, Groningen (Netherlands)

    2008-09-15

    Therapy advice based on dual-source computed tomography (DSCT) in comparison with coronary angiography (CAG) was investigated and the results evaluated after 1-year follow-up. Thirty-three consecutive patients (mean age 61.9 years) underwent DSCT and CAG and were evaluated independently. In an expert reading (the ''gold standard''), CAG and DSCT examinations were evaluated simultaneously by an experienced radiologist and cardiologist. Based on the presence of significant stenosis and current guidelines, therapy advice was given by all readers blinded from the results of other readings and clinical information. Patients were treated based on a multidisciplinary team evaluation including all clinical information. In comparison with the gold standard, CAG had a higher specificity (91%) and positive predictive value (PPV) (95%) compared with DSCT (82% and 91%, respectively). DSCT had a higher sensitivity (96%) and negative predictive value (NPV) (89%) compared with CAG (91% and 83%, respectively). The DSCT-based therapy advice did not lead to any patient being denied the revascularization they needed according to the multidisciplinary team evaluation. During follow-up, two patients needed additional revascularization. The high NPV for DSCT for revascularization assessment indicates that DSCT could be safely used to select patients benefiting from medical therapy only. (orig.)

  9. Development of a Tunable LED-Based Colorimetric Source

    OpenAIRE

    Brown, Steven W.; Santana, Carlos; Eppeldauer, George P.

    2002-01-01

    A novel, spectrally tunable light-source utilizing light emitting diodes (LEDs) for radiometric, photometric, and colorimetric applications is described. The tunable source can simulate standard sources and can be used as a transfer source to propagate photometric and colorimetric scales from calibrated reference instruments to test artifacts with minimal increase in uncertainty. In this prototype source, 40 LEDs with 10 different spectral distributions were mounted onto an integrating sphere...

  10. Native pattern defect inspection of EUV mask using advanced electron beam inspection system

    Science.gov (United States)

    Shimomura, Takeya; Inazuki, Yuichi; Abe, Tsukasa; Takikawa, Tadahiko; Mohri, Hiroshi; Hayashi, Naoya; Wang, Fei; Ma, Long; Zhao, Yan; Kuan, Chiyan; Xiao, Hong; Jau, Jack

    2010-09-01

    Fabrication of defect free EUV mask is one of the most critical roadblocks for implementing EUV lithography into semiconductor high volume manufacturing for 22nm half-pitch (HP) node and beyond. At the same time, development of quality assurance process for the defect free EUV mask is also another critical challenge we need to address before the mass production. Inspection tools act important role in quality assurance process to ensure the defect free EUV mask. We are currently evaluating two types of inspection system: optical inspection (OPI) system and electron beam inspection (EBI) system [1, 2]. While OPI system is sophisticated technology and has an advantage in throughput, EBI system is superior in sensitivity and extendability to even small pattern. We evaluated sensitivity of EBI system and found it could detect 25 nm defects on 88nm L/S pattern which is as small as target defect size for 23 nm Flash HP pattern in 2013 in 2009 ITRS lithography roadmap [2, 3]. EBI system is effective inspection tool even at this moment to detect such small defects on 88nm HP pattern, though there are still some challenges such as the slow throughput and the reliability. Therefore, EBI system can be used as bridge tool to compensate insufficient sensitivity of current inspection tools and improve EUV mask fabrication process to achieve the defect free EUV mask. In this paper, we will present the results of native pattern defects founded on large field 88nm HP pattern using advance EBI system. We will also classify those defects and propose some ideas to mitigate them and realize the defect free EUV mask, demonstrating the capability of EBI as bridge tool.

  11. Ultrabroadband terahertz source and beamline based on coherent transition radiation

    Directory of Open Access Journals (Sweden)

    S. Casalbuoni

    2009-03-01

    Full Text Available Coherent transition radiation (CTR in the THz regime is an important diagnostic tool for analyzing the temporal structure of the ultrashort electron bunches needed in ultraviolet and x-ray free-electron lasers. It is also a powerful source of such radiation, covering an exceptionally broad frequency range from about 200 GHz to 100 THz. At the soft x-ray free-electron laser FLASH we have installed a beam transport channel for transition radiation (TR with the intention to guide a large fraction of the radiation to a laboratory outside the accelerator tunnel. The radiation is produced on a screen inside the ultrahigh vacuum beam pipe of the linac, coupled out through a diamond window and transported to the laboratory through an evacuated tube equipped with five focusing and four plane mirrors. The design of the beamline has been based on a thorough analysis of the generation of TR on metallic screens of limited size. The optical propagation of the radiation has been computed taking into account the effects of near-field (Fresnel diffraction. The theoretical description of the TR source is presented in the first part of the paper, while the design principles and the technical layout of the beamline are described in the second part. First experimental results demonstrate that the CTR beamline covers the specified frequency range and preserves the narrow time structure of CTR pulses emitted by short electron bunches.

  12. Optimal source localization problem based on TOA measurements

    Directory of Open Access Journals (Sweden)

    Rosić Maja

    2017-01-01

    Full Text Available Determining an optimal emitting source location based on the time of arrival (TOA measurements is one of the important problems in Wireless Sensor Networks (WSNs. The nonlinear least-squares (NLS estimation technique is employed to obtain the location of an emitting source. This optimization problem has been formulated by the minimization of the sum of squared residuals between estimated and measured data as the objective function. This paper presents a hybridization of Genetic Algorithm (GA for the determination of the global optimum solution with the local search Newton-Raphson (NR method. The corresponding Cramer-Rao lower bound (CRLB on the localization errors is derived, which gives a lower bound on the variance of any unbiased estimator. Simulation results under different signal-to-noise-ratio (SNR conditions show that the proposed hybrid Genetic Algorithm-Newton-Raphson (GA-NR improves the accuracy and efficiency of the optimal solution compared to the regular GA. [Project of the Serbian Ministry of Education, Science and Technological Development, Grant no. TR32028

  13. BREAKOUT RECONNECTION OBSERVED BY THE TESIS EUV TELESCOPE

    Energy Technology Data Exchange (ETDEWEB)

    Reva, A. A.; Ulyanov, A. S.; Shestov, S. V.; Kuzin, S. V., E-mail: reva.antoine@gmail.com [Lebedev Physical Institute, Russian Academy of Sciences (Russian Federation)

    2016-01-10

    We present experimental evidence of the coronal mass ejection (CME) breakout reconnection, observed by the TESIS EUV telescope. The telescope could observe solar corona up to 2 R{sub ⊙} from the Sun center in the Fe 171 Å line. Starting from 2009 April 8, TESIS observed an active region (AR) that had a quadrupolar structure with an X-point 0.5 R{sub ⊙} above photosphere. A magnetic field reconstructed from the Michelson Doppler Imager data also has a multipolar structure with an X-point above the AR. At 21:45 UT on April 9, the loops near the X-point started to move away from each other with a velocity of ≈7 km s{sup −1}. At 01:15 UT on April 10, a bright stripe appeared between the loops, and the flux in the GOES 0.5–4 Å channel increased. We interpret the loops’ sideways motion and the bright stripe as evidence of the breakout reconnection. At 01:45 UT, the loops below the X-point started to slowly move up. At 15:10 UT, the CME started to accelerate impulsively, while at the same time a flare arcade formed below the CME. After 15:50 UT, the CME moved with constant velocity. The CME evolution precisely followed the breakout model scenario.

  14. Breakout Reconnection Observed by the TESIS EUV Telescope

    Science.gov (United States)

    Reva, A. A.; Ulyanov, A. S.; Shestov, S. V.; Kuzin, S. V.

    2016-01-01

    We present experimental evidence of the coronal mass ejection (CME) breakout reconnection, observed by the TESIS EUV telescope. The telescope could observe solar corona up to 2 R⊙ from the Sun center in the Fe 171 Å line. Starting from 2009 April 8, TESIS observed an active region (AR) that had a quadrupolar structure with an X-point 0.5 R⊙ above photosphere. A magnetic field reconstructed from the Michelson Doppler Imager data also has a multipolar structure with an X-point above the AR. At 21:45 UT on April 9, the loops near the X-point started to move away from each other with a velocity of ≈7 km s-1. At 01:15 UT on April 10, a bright stripe appeared between the loops, and the flux in the GOES 0.5-4 Å channel increased. We interpret the loops’ sideways motion and the bright stripe as evidence of the breakout reconnection. At 01:45 UT, the loops below the X-point started to slowly move up. At 15:10 UT, the CME started to accelerate impulsively, while at the same time a flare arcade formed below the CME. After 15:50 UT, the CME moved with constant velocity. The CME evolution precisely followed the breakout model scenario.

  15. PV source based high voltage gain current fed converter

    Science.gov (United States)

    Saha, Soumya; Poddar, Sahityika; Chimonyo, Kudzai B.; Arunkumar, G.; Elangovan, D.

    2017-11-01

    This work involves designing and simulation of a PV source based high voltage gain, current fed converter. It deals with an isolated DC-DC converter which utilizes boost converter topology. The proposed converter is capable of high voltage gain and above all have very high efficiency levels as proved by the simulation results. The project intends to produce an output of 800 V dc from a 48 V dc input. The simulation results obtained from PSIM application interface were used to analyze the performance of the proposed converter. Transformer used in the circuit steps up the voltage as well as to provide electrical isolation between the low voltage and high voltage side. Since the converter involves high switching frequency of 100 kHz, ultrafast recovery diodes are employed in the circuitry. The major application of the project is for future modeling of solar powered electric hybrid cars.

  16. Sources

    OpenAIRE

    2015-01-01

    Sources Fondation Pablo Iglesias. Alcala de Henares. Sections : Archives privées de Manuel ArijaArchives extérieuresArchives FNJS de EspañaPrensa Archives Générales de l’Administration. Alcala de Henares. Sections : Opposition au franquismeSig. 653 Sig TOP 82/68.103-68.602.Índice de las cartas colectivas, Relaciones, Cartas al Ministro de Información de Marzo de 1965. c.662. Sources cinématographiques Filmothèque Nationale d’Espagne.NO.DO. N° 1157C. 08/03/1965.aguirre Javier, Blanco vertical....

  17. Modeling and simulation of low-energy electron scattering in organic and inorganic EUV photoresists

    Science.gov (United States)

    Vaglio Pret, Alessandro; Graves, Trey; Blankenship, David; Biafore, John J.

    2017-03-01

    Alternative photoresist platforms are being developed with the goal of meeting Resolution, Roughness and Sensitivity requirements for EUV lithography. Metal-based materials appear promising due to the high etch resistance, high absorption, and high resolution. However, the exposure mechanism of these materials is quite different from that of organic chemically amplified resists. The current electron-scattering model built into PROLITHTM X6.0 allows a direct comparison of the exposure mechanisms for different resist platforms: in particular, it is now possible to estimate the intrinsic resist uncertainty by evaluating electron, acid shot noise and spatial blurring, while forcing the photon shot noise contribution to zero. A comparison between organic resists and metal-based platforms reveals how the denser nature of the latter help containing the electron scattering in a much closer radius around the absorption event. The consequent electron-reaction (acid generation for photo-active-generator-containing organic materials, ligand dissociation for the metal-oxides) reflects the electron shot noise of the different platforms. The higher absorption combined with lower blur of the metaloxide materials seem to become of crucial importance for the 5 nm technology node and beyond.

  18. Studies of extreme ultraviolet emission from laser produced plasmas, as sources for next generation lithography

    Science.gov (United States)

    Cummins, Thomas

    The work presented in this thesis is primarily concerned with the optimisation of extreme ultraviolet (EUV) photoemission around 13.5 nm, from laser produced tin (Sn) plasmas. EUV lithography has been identified as the leading next generation technology to take over from the current optical lithography systems, due to its potential of printing smaller feature sizes on integrated circuits. Many of the problems hindering the implementation of EUV lithography for high volume manufacturing have been overcome during the past 20 years of development. However, the lack of source power is a major concern for realising EUV lithography and remains a major roadblock that must be overcome. Therefore in order to optimise and improve the EUV emission from Sn laser plasma sources, many parameters contributing to the make-up of an EUV source are investigated. Chapter 3 presents the results of varying several different experimental parameters on the EUV emission from Sn laser plasmas. Several of the laser parameters including the energy, gas mixture, focusing lens position and angle of incidence are changed, while their effect on the EUV emission is studied. Double laser pulse experiments are also carried out by creating plasma targets for the main laser pulse to interact with. The resulting emission is compared to that of a single laser pulse on solid Sn. Chapter 4 investigates tailoring the CO2 laser pulse duration to improve the efficiency of an EUV source set-up. In doing so a new technique for shortening the time duration of the pulse is described. The direct effects of shortening the CO2 laser pulse duration on the EUV emission from Sn are then studied and shown to improve the efficiency of the source. In Chapter 5 a new plasma target type is studied and compared to the previous dual laser experiments. Laser produced colliding plasma jet targets form a new plasma layer, with densities that can be optimised for re-heating with the main CO2 laser pulse. Chapter 6 will present

  19. Cross sections of EUV PAGs: influence of concentration, electron energy, and structure

    Science.gov (United States)

    Grzeskowiak, Steven; Narasimhan, Amrit; Wisehart, Liam; Schad, Jonathon; Neisser, Mark; Ocola, Leonidas E.; Brainard, Robert L.; Denbeaux, Greg

    2016-03-01

    Optimizing the photochemistry of extreme ultraviolet (EUV) photoresists should provide faster, more efficient resists which would lead to greater throughput in manufacturing. The fundamental reaction mechanisms in EUV resists are believed to be due to interactions with energetic electrons liberated by ionization. Identifying the likelihood (or cross section) of how these photoelectrons interact with resist components is critical to optimizing the performance of EUV resists. Chemically amplified resists utilize photoacid generators (PAGs) to improve sensitivity; measuring the cross section of electron induced decomposition of different PAGs will provide insight into developing new resist materials. To study the interactions of photoelectrons generated by EUV absorption, photoresists were exposed to electron beams at energies between 80 and 250 eV. The reactions between PAG molecules and electrons were measured using a mass spectrometer to monitor the levels of small molecules produced by PAG decomposition that outgassed from the film. Comparing the cross sections of a variety of PAG molecules can provide insight into the relationship between chemical structure and reactivity to the electrons in their environments. This research is a part of a larger SEMATECH research program to understand the fundamentals of resist exposures to help in the development of new, better performing EUV resists.

  20. Comparison of EUV spectral and ion emission features from laser-produced Sn and Li plasmas

    Science.gov (United States)

    Coons, R. W.; Campos, D.; Crank, M.; Harilal, S. S.; Hassanein, A.

    2010-04-01

    Planar slabs of pure Sn and Li were irradiated with 1064 nm, 9 ns Nd:YAG laser pulses. The resulting plasmas were evaluated with an absolutely calibrated extreme ultraviolet (EUV) power tool, a transmission grating spectrograph, a pinhole camera, and a Faraday cup. These diagnostic tools have allowed us to determine EUV conversion efficiency (CE), EUV spectral emission features, EUV-emitting plasma size, and the kinetic energies and fluxes of ions at various laser intensities for both Sn and Li plasmas. The maximum estimated CE values for Li and Sn plasmas are 1 +/- 0.1 % and 2 +/- 0.2 %, respectively. The Li2+ Lyman-α line and Sn8-13+ lines generate the in-band emissions of Li and Sn. The intensity of Li2+ lines was found to increase with laser intensity. However, the Sn unresolved transmission array (UTA) showed remarkable changes with at higher laser intensities, including the appearance of a spectral dip. EUV plasma images showed that Sn plasmas take on a conical shape, as opposed to the hemispherical shape of Li plasmas. Ion debris analysis showed the kinetic energies for Li ions are less than that of Sn ions under similar conditions. Moreover, the kinetic spread of Li ions has been found to be narrower compared to the kinetic energy distribution of the Sn ions. We also compared the ion flux emitted by Sn and Li plasmas.

  1. Correlation of experimentally measured atomic scale properties of EUV photoresist to modeling performance: an exploration

    Science.gov (United States)

    Kandel, Yudhishthir; Chandonait, Jonathan; Melvin, Lawrence S.; Marokkey, Sajan; Yan, Qiliang; Grzeskowiak, Steven; Painter, Benjamin; Denbeaux, Gregory

    2017-03-01

    Extreme ultraviolet (EUV) lithography at 13.5 nm stands at the crossroads of next generation patterning technology for high volume manufacturing of integrated circuits. Photo resist models that form the part of overall pattern transform model for lithography play a vital role in supporting this effort. The physics and chemistry of these resists must be understood to enable the construction of accurate models for EUV Optical Proximity Correction (OPC). In this study, we explore the possibility of improving EUV photo-resist models by directly correlating the parameters obtained from experimentally measured atomic scale physical properties; namely, the effect of interaction of EUV photons with photo acid generators in standard chemically amplified EUV photoresist, and associated electron energy loss events. Atomic scale physical properties will be inferred from the measurements carried out in Electron Resist Interaction Chamber (ERIC). This study will use measured physical parameters to establish a relationship with lithographically important properties, such as line edge roughness and CD variation. The data gathered from these measurements is used to construct OPC models of the resist.

  2. Fission, spallation or fusion-based neutron sources

    Indian Academy of Sciences (India)

    2015-11-27

    Nov 27, 2015 ... In this paper the most promising technology for high power neutron sources is briefly discussed. The conclusion is that the route to high power neutron sources in the foreseeable future is spallation – short or long pulse or even CW – all of these sources will have areas in which they excel.

  3. Monte Carlo sensitivity analysis of EUV mask reflectivity and its impact on OPC accuracy

    Science.gov (United States)

    Chen, Yulu; Wood, Obert; Rankin, Jed; Gullikson, Eric; Meyer-Ilse, Julia; Sun, Lei; Qi, Zhengqing John; Goodwin, Francis; Kye, Jongwook

    2017-03-01

    Unlike optical masks which are transmissive optical elements, use of extreme ultraviolet (EUV) radiation requires a reflective mask structure - a multi-layer coating consisting of alternating layers of high-Z (wave impedance) and low-Z materials that provide enhanced reflectivity over a narrow wavelength band peaked at the Bragg wavelength.1 Absorber side wall angle, corner rounding,2 surface roughness,3 and defects4 affect mask performance, but even seemingly simple parameters like bulk reflectivity on mirror and absorber surfaces can have a profound influence on imaging. For instance, using inaccurate reflectivity values at small and large incident angles would diminish the benefits of source mask co-optimization (SMO) and result in larger than expected pattern shifts. The goal of our work is to calculate the variation in mask reflectivity due to various sources of inaccuracies using Monte Carlo simulations. Such calculation is necessary as small changes in the thickness and optical properties of the high-Z and low-Z materials can cause substantial variations in reflectivity. This is further complicated by undesirable intermixing between the two materials used to create the reflector.5 One of the key contributors to mask reflectivity fluctuation is identified to be the intermixing layer thickness. We also investigate the impacts on OPC when the wrong mask information is provided, and evaluate the deterioration of overlapping process window. For a hypothetical N7 via layer, the lack of accurate mask information costs 25% of the depth of focus at 5% exposure latitude. Our work would allow the determination of major contributors to mask reflectivity variation, drive experimental efforts of measuring such contributors, provide strategies to optimize mask reflectivity, and quantize the OPC errors due to imperfect mask modeling.

  4. Closed coronal structures. III - Comparison of static models with X-ray, EUV, and radio observations

    Science.gov (United States)

    Pallavicini, R.; Peres, G.; Serio, S.; Vaiana, G. S.; Golub, L.; Rosner, R.

    1981-01-01

    Numerical models of static coronal loops in energy balance are compared with high spatial resolution observations of extreme ultraviolet lines, broad-band X-ray emission, and interferometric observations at 2.8 cm of a solar active region. Difficulties of using scaling laws to test static models of coronal loops are reviewed. The theoretical model used for the comparison is summarized; the detailed X-ray, EUV, and microwave observations of the selected active region are presented; and the comparison of the model with the observations is performed. It is shown that simple static models with conductive flux vanishing at the loop base reproduce satisfactorily the observed properties in the upper portion of loop structures from compact, high-pressure loops in the core of the region to more extended, fainter loops and to large-scale loops interconnecting different active regions. Effects of changing loop parameters are investigated, and it is argued, that in contrast to the present approach, scaling laws cannot be used to discriminate between different static energy balance models. Some discrepancy is found between model predictions and observations for the lower sections of loop structures. Possible causes of the discrepancy are discussed.

  5. Scrape-off-layer current and EUV diagnostics and control on the HBT-EP tokamak

    Science.gov (United States)

    Levesque, J. P.; Mauel, M. E.; Bialek, J.; Navratil, G. A.; Delgado-Aparicio, L.; Hansen, C. J.

    2015-11-01

    Non-axisymmetric currents in the scrape-off-layer (SOL) and conducting structure of a tokamak can produce severe forces at high plasma performance, compromising the device's structural integrity. Diagnosing these currents during disruptions is important for extrapolating forces in future machines including ITER. Progress on designing components to measure and control SOL and vessel currents in the HBT-EP tokamak is presented. Movable tiles positioned around limiting surfaces will measure SOL and vessel currents during mode activity and disruptions. Biasable plates at divertor strike points will allow control of field-aligned SOL currents for kink mode control studies and will drive convection in the plasma edge. In-vessel Rogowski coils will measure currents in wall components with high spatial resolution. A planned EUV diagnostic upgrade is also presented. Four sets of 16 poloidal views will allow tomographic reconstruction of plasma emissivity and internal kink mode structure. A separate two-color, 16-chord tangential system will allow reconstruction of temperature profiles versus time. Measurements will be input to HBT-EP's GPU-based feedback system, providing active feedback for kink modes using only optical sensors and both magnetic and edge current actuators. Supported by U.S. DOE Grant DE-FG02-86ER53222.

  6. EUV blank defect and particle inspection with high throughput immersion AFM with 1nm 3D resolution

    NARCIS (Netherlands)

    Es, M.H. van; Sadeghian Marnani, H.

    2016-01-01

    Inspection of EUV mask substrates and blanks is demanding. We envision this is a good target application for massively parallel Atomic Force Microscopy (AFM). We envision to do a full surface characterization of EUV masks with AFM enabling 1nm true 3D resolution over the entire surface. The limiting

  7. Source-based neurofeedback methods using EEG recordings: Training altered brain activity in a functional brain source derived from Blind Source Separation

    Directory of Open Access Journals (Sweden)

    David James White

    2014-10-01

    Full Text Available A developing literature explores the use of neurofeedback in the treatment of a range of clinical conditions, particularly ADHD and epilepsy, whilst neurofeedback also provides an experimental tool for studying the functional significance of endogenous brain activity. A critical component of any neurofeedback method is the underlying physiological signal which forms the basis for the feedback. While the past decade has seen the emergence of fMRI-based protocols training spatially confined BOLD activity, traditional neurofeedback has utilized a small number of electrode sites on the scalp. As scalp EEG at a given electrode site reflects a linear mixture of activity from multiple brain sources and artifacts, efforts to successfully acquire some level of control over the signal may be confounded by these extraneous sources. Further, in the event of successful training, these traditional neurofeedback methods are likely influencing multiple brain regions and processes. The present work describes the use of source-based signal processing methods in EEG neurofeedback. The feasibility and potential utility of such methods were explored in an experiment training increased theta oscillatory activity in a source derived from Blind Source Separation of EEG data obtained during completion of a complex cognitive task (spatial navigation. Learned increases in theta activity were observed in two of the four participants to complete 20 sessions of neurofeedback targeting this individually defined functional brain source. Source-based EEG neurofeedback methods using Blind Source Separation may offer important advantages over traditional neurofeedback, by targeting the desired physiological signal in a more functionally and spatially specific manner. Having provided preliminary evidence of the feasibility of these methods, future work may study a range of clinically and experimentally relevant brain processes targeting individual brain sources by source-based EEG

  8. Wavelength-specific reflections: A decade of EUV actinic mask inspection research

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth; Mochi, Iacopo

    2010-12-31

    Mask inspection is essential for the success of any pattern-transfer lithography technology, and EUV Lithography in particular faces unique challenges. EUV masks resonant-reflective multilayer coatings have a narrow, wavelength-specific response that dramatically affects the way that defects appear, or disappear, at various illuminating wavelengths. Furthermore, the ever-shrinking size of 'critical' defects limits the potential effectiveness of DUV inspection techniques over time. Researchers pursuing numerous ways of finding and characterizing defects on EUV masks and have met with varying degrees of success. Their lessons inform the current, urgent exploration to select the most effective techniques for high-volume manufacturing. Ranging from basic research and demonstration experiments to commercial inspection tool prototypes, we survey the recent history of work in this area, including sixteen projects in Europe, Asia, and America. Solutions range from scanning beams to microscopy, dark field imaging to pattern transfer.

  9. Journalistic Sources: Conceptual bases for a digital system

    OpenAIRE

    Walter Teixeira Lima Junior

    2006-01-01

    This article contains definitions of concepts and a bibliographical revision of the fi rst part of the post-doctorate research work which aims at the production of software for the search for and qualitative validation of journalistic sources of information. The text touches on biological memory, decision-making and fundamental concepts for the choice of a journalistic source: nature of the source, credibility, prestige and currency. These aspects permeate and infl uence the choice (decision-mak...

  10. A novel amblyopia treatment system based on LED light source

    Science.gov (United States)

    Zhang, Xiaoqing; Chen, Qingshan; Wang, Xiaoling

    2011-05-01

    A novel LED (light emitting diode) light source of five different colors (white, red, green, blue and yellow) is adopted instead of conventional incandescent lamps for an amblyopia treatment system and seven training methods for rectifying amblyopia are incorporated so as for achieving an integrated therapy. The LED light source is designed to provide uniform illumination, adjustable light intensity and alterable colors. Experimental tests indicate that the LED light source operates steadily and fulfills the technical demand of amblyopia treatment.

  11. Concept for Risk-based Prioritisation of Point Sources

    DEFF Research Database (Denmark)

    Overheu, N.D.; Troldborg, Mads; Tuxen, N.

    2010-01-01

    A large number of point sources pose a threat to ground water resources. A new tool is presented which enables a uniform and transparent risk assessment and prioritisation of these point sources at the catchment scale. The tool integrates aquifer vulnerability mapping, site-specific mass flux...... estimates on a local scale from all the sources, and 3D catchment-scale fate and transport modelling. It handles point sources at various knowledge levels and accounts for uncertainties. The tool estimates the impacts on the water supply in the catchment and provides an overall prioritisation of the sites...

  12. Time resolved EUV pump-probe microscopy of fs-LASER induced nanostructure formation

    Science.gov (United States)

    Freiberger, R.; Hauck, J.; Reininghaus, M.; Wortmann, D.; Juschkin, L.

    2011-05-01

    We report on our efforts in design and construction of a compact Extreme Ultraviolet (EUV)-pump-probe microscope. The goal is the observation of formation of nanostructures, induced by a femtosecond (fs)-laser pulse. The unique interaction processes of fs-laser radiation with matter open up new markets in laser material processing and, therefore, are actively investigated in the last decade. The resulting "sub 100 nm"-structures offer vast potential benefits in photonics, biotechnology, tribological surface design, plasmonic applications and production of nanoparticles. Focused fs-laser radiation causes a local modification resulting in nanostructures of high precision and reproducibility. However the formation dynamics is not well understood. Research in this field requires high temporal and spatial resolution. A combination of fs-laser and EUV-microscope provides a tool for "in situ"-observation of the formation dynamics. As exemplary structures to be investigated, we use nanojets on thin gold films and periodic surface structures (ripples) on dielectrics. In the future, the EUV-pump-probe microscope can become a versatile tool to observe physical or biological processes. Microscopy using EUV-light is capable of detecting structures on a scale down to several tens of nanometers. For detailed investigations a compact EUV-microscope has been realized utilizing OVI Balmer-alpha radiation at 17.3 nm coming from a discharge produced oxygen plasma. As optical elements a grazing incidence elliptical collector and a zone plate with a width of outermost zone of 50 nm and a spectral filter to avoid chromatic aberrations are used. The detector is a fast gated microchannel plate with a pore size of 2 microns contacted by a low impedance transmission line. The expected spatial resolution of the setup is better than 100 nm and the time resolution is better than 1 ns. The newly developed EUV-microscope is a powerful tool for a wide field of investigations that need high time

  13. New method of detection and classification of yield-impacting EUV mask defects

    Science.gov (United States)

    Graur, Ioana; Vengertsev, Dmitry; Raghunathan, Ananthan; Stobert, Ian; Rankin, Jed

    2015-10-01

    Extreme ultraviolet lithography (EUV) advances printability of small size features for both memory and logic semiconductor devices. It promises to bring relief to the semiconductor manufacturing industry, removing the need for multiple masks in rendering a single design layer on wafer. However, EUV also brings new challenges, one of which is of mask defectivity. For this purpose, much of the focus in recent years has been in finding ways to adequately detect, characterize, and reduce defects on both EUV blanks and patterned masks. In this paper we will present an efficient way to classify and disposition EUV mask defects through a new algorithm developed to classify defects located on EUV photomasks. By processing scanning electronmicroscopy images (SEM) of small regions of a photomask, we extract highdimensional local features Histograms of Oriented Gradients (HOG). Local features represent image contents compactly for detection or classification, without requiring image segmentation. Using these HOGs, a supervised classification method is applied which allows differentiating between nondefective and defective images. In the new approach we have developed a superior method of detection and classification of defects, using mask and supporting mask printed data from several metallization masks. We will demonstrate that use of the HOG method allows realtime identification of defects on EUV masks regardless of geometry or construct. The defects identified by this classifier are further divided into subclasses for mask defect disposition: foreign material, foreign material from previous step, and topological defects. The goal of disposition is to categorize on the images into subcategories and provide recommendation of prescriptive actions to avoid impact on the wafer yield.

  14. Digital time stamping system based on open source technologies.

    Science.gov (United States)

    Miskinis, Rimantas; Smirnov, Dmitrij; Urba, Emilis; Burokas, Andrius; Malysko, Bogdan; Laud, Peeter; Zuliani, Francesco

    2010-03-01

    A digital time stamping system based on open source technologies (LINUX-UBUNTU, OpenTSA, OpenSSL, MySQL) is described in detail, including all important testing results. The system, called BALTICTIME, was developed under a project sponsored by the European Commission under the Program FP 6. It was designed to meet the requirements posed to the systems of legal and accountable time stamping and to be applicable to the hardware commonly used by the national time metrology laboratories. The BALTICTIME system is intended for the use of governmental and other institutions as well as personal bodies. Testing results demonstrate that the time stamps issued to the user by BALTICTIME and saved in BALTICTIME's archives (which implies that the time stamps are accountable) meet all the regulatory requirements. Moreover, the BALTICTIME in its present implementation is able to issue more than 10 digital time stamps per second. The system can be enhanced if needed. The test version of the BALTICTIME service is free and available at http://baltictime. pfi.lt:8080/btws/ and http://baltictime.lnmc.lv:8080/btws/.

  15. Wave equation based microseismic source location and velocity inversion

    Science.gov (United States)

    Zheng, Yikang; Wang, Yibo; Chang, Xu

    2016-12-01

    The microseismic event locations and velocity information can be used to infer the stress field and guide hydraulic fracturing process, as well as to image the subsurface structures. How to get accurate microseismic event locations and velocity model is the principal problem in reservoir monitoring. For most location methods, the velocity model has significant relation with the accuracy of the location results. The velocity obtained from log data is usually too rough to be used for location directly. It is necessary to discuss how to combine the location and velocity inversion. Among the main techniques for locating microseismic events, time reversal imaging (TRI) based on wave equation avoids traveltime picking and offers high-resolution locations. Frequency dependent wave equation traveltime inversion (FWT) is an inversion method that can invert velocity model with source uncertainty at certain frequency band. Thus we combine TRI with FWT to produce improved event locations and velocity model. In the proposed approach, the location and model information are interactively used and updated. Through the proposed workflow, the inverted model is better resolved and the event locations are more accurate. We test this method on synthetic borehole data and filed data of a hydraulic fracturing experiment. The results verify the effectiveness of the method and prove it has potential for real-time microseismic monitoring.

  16. A Source Anonymity-Based Lightweight Secure AODV Protocol for Fog-Based MANET

    Directory of Open Access Journals (Sweden)

    Weidong Fang

    2017-06-01

    Full Text Available Fog-based MANET (Mobile Ad hoc networks is a novel paradigm of a mobile ad hoc network with the advantages of both mobility and fog computing. Meanwhile, as traditional routing protocol, ad hoc on-demand distance vector (AODV routing protocol has been applied widely in fog-based MANET. Currently, how to improve the transmission performance and enhance security are the two major aspects in AODV’s research field. However, the researches on joint energy efficiency and security seem to be seldom considered. In this paper, we propose a source anonymity-based lightweight secure AODV (SAL-SAODV routing protocol to meet the above requirements. In SAL-SAODV protocol, source anonymous and secure transmitting schemes are proposed and applied. The scheme involves the following three parts: the source anonymity algorithm is employed to achieve the source node, without being tracked and located; the improved secure scheme based on the polynomial of CRC-4 is applied to substitute the RSA digital signature of SAODV and guarantee the data integrity, in addition to reducing the computation and energy consumption; the random delayed transmitting scheme (RDTM is implemented to separate the check code and transmitted data, and achieve tamper-proof results. The simulation results show that the comprehensive performance of the proposed SAL-SAODV is a trade-off of the transmission performance, energy efficiency, and security, and better than AODV and SAODV.

  17. A Source Anonymity-Based Lightweight Secure AODV Protocol for Fog-Based MANET.

    Science.gov (United States)

    Fang, Weidong; Zhang, Wuxiong; Xiao, Jinchao; Yang, Yang; Chen, Wei

    2017-06-17

    Fog-based MANET (Mobile Ad hoc networks) is a novel paradigm of a mobile ad hoc network with the advantages of both mobility and fog computing. Meanwhile, as traditional routing protocol, ad hoc on-demand distance vector (AODV) routing protocol has been applied widely in fog-based MANET. Currently, how to improve the transmission performance and enhance security are the two major aspects in AODV's research field. However, the researches on joint energy efficiency and security seem to be seldom considered. In this paper, we propose a source anonymity-based lightweight secure AODV (SAL-SAODV) routing protocol to meet the above requirements. In SAL-SAODV protocol, source anonymous and secure transmitting schemes are proposed and applied. The scheme involves the following three parts: the source anonymity algorithm is employed to achieve the source node, without being tracked and located; the improved secure scheme based on the polynomial of CRC-4 is applied to substitute the RSA digital signature of SAODV and guarantee the data integrity, in addition to reducing the computation and energy consumption; the random delayed transmitting scheme (RDTM) is implemented to separate the check code and transmitted data, and achieve tamper-proof results. The simulation results show that the comprehensive performance of the proposed SAL-SAODV is a trade-off of the transmission performance, energy efficiency, and security, and better than AODV and SAODV.

  18. Numerical and experimental studies of the carbon etching in EUV-induced plasma

    CERN Document Server

    Astakhov, D I; Lee, C J; Ivanov, V V; Krivtsun, V M; Yakushev, O; Koshelev, K N; Lopaev, D V; Bijkerk, F

    2015-01-01

    We have used a combination of numerical modeling and experiments to study carbon etching in the presence of a hydrogen plasma. We model the evolution of a low density EUV-induced plasma during and after the EUV pulse to obtain the energy resolved ion fluxes from the plasma to the surface. By relating the computed ion fluxes to the experimentally observed etching rate at various pressures and ion energies, we show that at low pressure and energy, carbon etching is due to chemical sputtering, while at high pressure and energy a reactive ion etching process is likely to dominate.

  19. Source-based neurofeedback methods using EEG recordings: training altered brain activity in a functional brain source derived from blind source separation.

    Science.gov (United States)

    White, David J; Congedo, Marco; Ciorciari, Joseph

    2014-01-01

    A developing literature explores the use of neurofeedback in the treatment of a range of clinical conditions, particularly ADHD and epilepsy, whilst neurofeedback also provides an experimental tool for studying the functional significance of endogenous brain activity. A critical component of any neurofeedback method is the underlying physiological signal which forms the basis for the feedback. While the past decade has seen the emergence of fMRI-based protocols training spatially confined BOLD activity, traditional neurofeedback has utilized a small number of electrode sites on the scalp. As scalp EEG at a given electrode site reflects a linear mixture of activity from multiple brain sources and artifacts, efforts to successfully acquire some level of control over the signal may be confounded by these extraneous sources. Further, in the event of successful training, these traditional neurofeedback methods are likely influencing multiple brain regions and processes. The present work describes the use of source-based signal processing methods in EEG neurofeedback. The feasibility and potential utility of such methods were explored in an experiment training increased theta oscillatory activity in a source derived from Blind Source Separation (BSS) of EEG data obtained during completion of a complex cognitive task (spatial navigation). Learned increases in theta activity were observed in two of the four participants to complete 20 sessions of neurofeedback targeting this individually defined functional brain source. Source-based EEG neurofeedback methods using BSS may offer important advantages over traditional neurofeedback, by targeting the desired physiological signal in a more functionally and spatially specific manner. Having provided preliminary evidence of the feasibility of these methods, future work may study a range of clinically and experimentally relevant brain processes where individual brain sources may be targeted by source-based EEG neurofeedback.

  20. Source-based neurofeedback methods using EEG recordings: training altered brain activity in a functional brain source derived from blind source separation

    Science.gov (United States)

    White, David J.; Congedo, Marco; Ciorciari, Joseph

    2014-01-01

    A developing literature explores the use of neurofeedback in the treatment of a range of clinical conditions, particularly ADHD and epilepsy, whilst neurofeedback also provides an experimental tool for studying the functional significance of endogenous brain activity. A critical component of any neurofeedback method is the underlying physiological signal which forms the basis for the feedback. While the past decade has seen the emergence of fMRI-based protocols training spatially confined BOLD activity, traditional neurofeedback has utilized a small number of electrode sites on the scalp. As scalp EEG at a given electrode site reflects a linear mixture of activity from multiple brain sources and artifacts, efforts to successfully acquire some level of control over the signal may be confounded by these extraneous sources. Further, in the event of successful training, these traditional neurofeedback methods are likely influencing multiple brain regions and processes. The present work describes the use of source-based signal processing methods in EEG neurofeedback. The feasibility and potential utility of such methods were explored in an experiment training increased theta oscillatory activity in a source derived from Blind Source Separation (BSS) of EEG data obtained during completion of a complex cognitive task (spatial navigation). Learned increases in theta activity were observed in two of the four participants to complete 20 sessions of neurofeedback targeting this individually defined functional brain source. Source-based EEG neurofeedback methods using BSS may offer important advantages over traditional neurofeedback, by targeting the desired physiological signal in a more functionally and spatially specific manner. Having provided preliminary evidence of the feasibility of these methods, future work may study a range of clinically and experimentally relevant brain processes where individual brain sources may be targeted by source-based EEG neurofeedback. PMID

  1. Voltage sag source location based on instantaneous energy detection

    DEFF Research Database (Denmark)

    Chen, Zhe; Xinzhou, Dong; Wei, Kong

    2007-01-01

    Voltage sag is the major power quality problem, which could disrupt the operation of sensitive equipment. This paper presents the applications of instantaneous energy direction for voltage sag source detection. Simulations have been performed to provide the analysis for system with distributed...... generation units. The studies show that the presented method can effectively detect the location of the voltage sag source....

  2. Journalistic Sources: Conceptual bases for a digital system

    Directory of Open Access Journals (Sweden)

    Walter Teixeira Lima Junior

    2006-12-01

    Full Text Available This article contains definitions of concepts and a bibliographical revision of the fi rst part of the post-doctorate research work which aims at the production of software for the search for and qualitative validation of journalistic sources of information. The text touches on biological memory, decision-making and fundamental concepts for the choice of a journalistic source: nature of the source, credibility, prestige and currency. These aspects permeate and infl uence the choice (decision-making of the professional who needs a source to carry out his work. They are classifi ed, categorized, structured and interrelated, in order to serve as consolidated, reliable parameters for software to perform the task of selection of the best journalistic sources without the mistakes/problems pointed out by researchers in the area.

  3. Sources

    OpenAIRE

    2014-01-01

    Archives Archivo Histórico del Estado de Jalisco Fondo Gobernación, Asunto Pasaportes y Salvoconductos : G-8-877/9773-9775 G-8-878/9774, 9776, 9777 et 9781 G-8-879/9782-9788 G-8-880/9789-9798 G-8-881-882/9803 G-8-882/9804-9805 G-8-883/9806-9811 G-8-884/9813 G-8-885/9817-9820 G-8-886/9822-9825 G-8-887/9826-9830 G-8-888/9835 G-8-889-890/9837 G-8-889/9839 Sources imprimées Livres et chroniques O’Farrill Romulo, (2004) Reseña histórica estadística y comercial de México y sus estados, directorio g...

  4. The statistical challenges of wavelet-based source detection

    Science.gov (United States)

    Freeman, Peter E.; Kashyap, V.; Rosner, R.; Lamb, D. Q.

    Wavelet functions are proving extremely useful for detecting sources in binned, two-dimensional photon counts images. In this chapter, we describe the mission-independent source detection algorithm WAVDETECT, part of the Chandra Interactive Analysis of Observations (CIAO) softwave package, and discuss the statistical challenges we have faced in its development, such as: what is the best way to estimate the local background in each pixel, if it is a priori unknown? What is the best way to eliminate false detections caused by instrumental variations? And what is the significance of a detected source?

  5. Technological ion sources based on the vacuum arc discharge

    CERN Document Server

    Bugaev, S P; Oks, E M; Yushkov, G Y; Shchanin, P M; Braun, Y

    2001-01-01

    The Titan service ion sources are designed to generate wide-aperture high-current ion beams of gases or metals, as well as, mixed two-component gas and metal ion beams with the controllable ratio of components in a beam. This possibility is achieved via integration of two discharge systems in a source discharge system. To generate metal ions one uses a vacuum, arc discharge, while gas ions are generated by a low pressure contracted arc discharge with cold cathodes. The paper describes operation of these sources, their design, technical characteristics, peculiarities of their operation and application fields

  6. Line-Source Based X-Ray Tomography

    OpenAIRE

    Deepak Bharkhada; Hengyong Yu; Hong Liu; Robert Plemmons; Ge Wang

    2009-01-01

    Current computed tomography (CT) scanners, including micro-CT scanners, utilize a point x-ray source. As we target higher and higher spatial resolutions, the reduced x-ray focal spot size limits the temporal and contrast resolutions achievable. To overcome this limitation, in this paper we propose to use a line-shaped x-ray source so that many more photons can be generated, given a data acquisition interval. In reference to the simultaneous algebraic reconstruction technique (SART) algorithm...

  7. Real-time tunability of chip-based light source enabled by microfluidic mixing

    DEFF Research Database (Denmark)

    Olsen, Brian Bilenberg; Rasmussen, Torben; Balslev, Søren

    2006-01-01

    We demonstrate real-time tunability of a chip-based liquid light source enabled by microfluidic mixing. The mixer and light source are fabricated in SU-8 which is suitable for integration in SU-8-based laboratory-on-a-chip microsystems. The tunability of the light source is achieved by changing...

  8. Prospects of Source-Separation-Based Sanitation Concepts: A Model-Based Study

    Directory of Open Access Journals (Sweden)

    Cees Buisman

    2013-07-01

    Full Text Available Separation of different domestic wastewater streams and targeted on-site treatment for resource recovery has been recognized as one of the most promising sanitation concepts to re-establish the balance in carbon, nutrient and water cycles. In this study a model was developed based on literature data to compare energy and water balance, nutrient recovery, chemical use, effluent quality and land area requirement in four different sanitation concepts: (1 centralized; (2 centralized with source-separation of urine; (3 source-separation of black water, kitchen refuse and grey water; and (4 source-separation of urine, feces, kitchen refuse and grey water. The highest primary energy consumption of 914 MJ/capita(cap/year was attained within the centralized sanitation concept, and the lowest primary energy consumption of 437 MJ/cap/year was attained within source-separation of urine, feces, kitchen refuse and grey water. Grey water bio-flocculation and subsequent grey water sludge co-digestion decreased the primary energy consumption, but was not energetically favorable to couple with grey water effluent reuse. Source-separation of urine improved the energy balance, nutrient recovery and effluent quality, but required larger land area and higher chemical use in the centralized concept.

  9. Underdetermined Blind Source Separation of Synchronous Orthogonal Frequency Hopping Signals Based on Single Source Points Detection.

    Science.gov (United States)

    Zhang, Chaozhu; Wang, Yu; Jing, Fulong

    2017-09-11

    This paper considers the complex-valued mixing matrix estimation and direction-of-arrival (DOA) estimation of synchronous orthogonal frequency hopping (FH) signals in the underdetermined blind source separation (UBSS). A novel mixing matrix estimation algorithm is proposed by detecting single source points (SSPs) where only one source contributes its power. Firstly, the proposed algorithm distinguishes the SSPs by the comparison of the normalized coefficients of time frequency (TF) points, which is more effective than existing detection algorithms. Then, mixing matrix of FH signals can be estimated by the hierarchical clustering method. To sort synchronous orthogonal FH signals, a modified subspace projection method is presented to obtain the DOAs of FH. One superiority of this paper is that the estimation accuracy of the mixing matrix can be significantly improved by the proposed SSPs detection criteria. Another superiority of this paper is that synchronous orthogonal FH signals can be sorted in underdetermined condition. The experimental results demonstrate the efficiency of the two proposed algorithms.

  10. EUV mask pattern inspection with an advanced electron beam inspection system

    Science.gov (United States)

    Shimomura, Takeya; Inazuki, Yuichi; Tsukasa, Abe; Takikawa, Tadahiko; Morikawa, Yasutaka; Mohri, Hiroshi; Hayashi, Naoya; Wang, Fei; Ma, Long; Zhao, Yan; Kuan, Chiyan; Xiao, Hong; Jau, Jack

    2009-12-01

    Readiness of defect-free mask is one of the biggest challenges to insert extreme ultraviolet (EUV) lithography into semiconductor high volume manufacturing for 22nm half pitch (HP) node and beyond. According to ITRS roadmap updated in 2008, minimum size of defect needed to be removed is 25nm for 22nm HP node in 2013 [1]. It is necessary, therefore, to develop EUV mask pattern inspection tool being capable of detecting 25nm defect. Electron beam inspection (EBI) is one of promising tools which will be able to meet such a tight defect requirement. In this paper, we evaluated defect detection sensitivity of electron beam inspection (EBI) system developed by Hermes Microvision, Inc. (HMI) using 88nm half-pitch (HP) line-and-space (L/S) pattern and 128nm HP contact-hole (C/H) pattern EUV mask. We found the EBI system can detect 25nm defects. We, furthermore, fabricated 4 types of EUV mask structures: 1) w/ anti-reflective (AR) layer and w/ buffer layer, 2) w/ AR layer and w/o buffer layer, 3) w/o AR layer and w/ buffer layer, 4) w/o AR layer and w/o buffer layer. And the sensitivity and inspectability for the EBI were compared. It was observed that w/o AR layer structure introduce higher image contrast and lead to better inspectability, although there is no significant different in sensitivity.

  11. RapidNano: towards 20nm Particle Detection on EUV Mask Blanks

    NARCIS (Netherlands)

    Donck, J.C.J. van der; Bussink, P.G.W.; Fritz, E.C.; Walle, P. van der

    2016-01-01

    Cleanliness is a prerequisite for obtaining economically feasible yield levels in the semiconductor industry. For the next generation of lithographic equipment, EUV lithography, the size of yield-loss inducing particles for the masks will be smaller than 20 nm. Consequently, equipment for handling

  12. Investigating the intrinsic cleanliness of automated handling designed for EUV mask Pod-in-Pod systems

    NARCIS (Netherlands)

    Brux, O.; Walle, P. van der; Donck, J.C.J. van der; Dress, P.

    2011-01-01

    Extreme Ultraviolet Lithography (EUVL) is the most promising solution for technology nodes 16nm (hp) and below. However, several unique EUV mask challenges must be resolved for a successful launch of the technology into the market. Uncontrolled introduction of particles and/or contamination into the

  13. The EUV Spectrum of Sunspot Plumes Observed by SUMER on SOHO

    Indian Academy of Sciences (India)

    In sunspot plumes the EUV spectrum differs from the quiet Sun; continua are observed with different slopes and intensities; emission lines from molecular hydrogen and many unidentified species indicate unique plasma conditions above sunspots. Sunspot plumes are sites of systematic downflow. We also discuss the ...

  14. Multiple Source Localization Based on Acoustic Map De-Emphasis

    Directory of Open Access Journals (Sweden)

    Brutti Alessio

    2010-01-01

    Full Text Available This paper describes a novel approach for localization of multiple sources overlapping in time. The proposed algorithm relies on acoustic maps computed in multi-microphone settings, which are descriptions of the distribution of the acoustic activity in a monitored area. Through a proper processing of the acoustic maps, the positions of two or more simultaneously active acoustic sources can be estimated in a robust way. Experimental results obtained on real data collected for this specific task show the capabilities of the given method both with distributed microphone networks and with compact arrays.

  15. LIGHT SOURCE: Design of a new compact THz source based on Smith-Purcell radiation

    Science.gov (United States)

    Dai, Dong-Dong; Bei, Hua; Dai, Zhi-Min

    2009-06-01

    In recent years, people are dedicated to the research work of finding compact THz sources with high emission power. Smith-Purcell radiation is qualified for the possibility of coherent enhancement due to the effect of FEL mechanism. The compact experiment device is expected to produce hundreds mW level THz ray. The electron beam with good quality is provided under the optimized design of the electron gun. Besides, the grating is designed as an oscillator without any external feedbacks. While the beam passes through the grating surface, the beam bunching will be strong and the second harmonics enhancement will be evident, as is seen from the simulation results.

  16. Market-based support schemes for renewable energy sources

    NARCIS (Netherlands)

    Fagiani, R.

    2014-01-01

    The European Union set ambitious goals regarding the production of electricity from renewable energy sources and the majority of European governments have implemented policies stimulating investments in such technologies. Support schemes differ in many aspects, not only in their effectivity and

  17. Quantum-dot-based integrated non-linear sources

    DEFF Research Database (Denmark)

    Bernard, Alice; Mariani, Silvia; Andronico, Alessio

    2015-01-01

    The authors report on the design and the preliminary characterisation of two active non-linear sources in the terahertz and near-infrared range. The former is associated to difference-frequency generation between whispering gallery modes of an AlGaAs microring resonator, whereas the latter...

  18. Fission, spallation or fusion-based neutron sources

    Indian Academy of Sciences (India)

    The development of the brightness of X-ray facilities (compilation from Friso van der Veen Paul Scherrer Institut, Villigen, CH). neutron flux of a spallation source will increase markedly at each step, when going from short pulse to long pulse as in the extreme case to CW operation). Of the tremendous progress in science ...

  19. Four Years of EUVE Observations of the Bursting Gamma-Ray Emitting Blazar Markarian 421

    Science.gov (United States)

    Cagnoni, Ilaria; Fruscione, Antonella; Papadakis, Iossif

    1998-01-01

    We present spectral and timing analysis of all the data collected by the Extreme Ultraviolet Explorer Satellite (EUVE) for the bright, nearby BL Lacertae object, Markarian 421, during the four-year period 1994-1997. During these years Mrk 421 has been observed by EUVE 4 times with the Deep-Survey/Spectrograph and 2 times with the imaging telescopes for a total of approximately 1.4 7nillions seconds. From 1993 to 1996 three very bright gamma ray flares were also detected by the Whipple observatory. In 1994 Mrk 421 was observed simultaneously by EUVE (Apr 2-12) and IUE one month before the TeV flare; of the 2 EUVF, observations (Feb 4-7 and Apr 25-May 13) of 1995, the second was part of a multiwavelength campaign that mapped the evolution of the TeV flare. In 1996 we observed Mrk 421 twice simultaneously with XTE: one immediately before (Apr 17-30) and another one (May 10-11) right after the May 7 1996 TeV flare. And finally in 1997 from Feb. 7 to Feb. ll. The total light curve seems to be smoothly varying on the long time-scale while on a shorter time-scale there is evidence of an EUVE flare well correlated to the TeV energy 1995 flare. We have analysed the three spectral data set in an homogenous way using the appropriate calibration data for the off-axis observations and our analysis confirms the presence of the absorption features around approximately 70A, in the entire 1995 dataset and possibly in the 1996 data set. We also show the first power spectrum analysis of the Mrk 421 EUVE lightcurves and a comparison with the power spectra predicted by current theoretical models.

  20. Fiber-based source for multiplex-CARS microscopy based on degenerate four-wave mixing.

    Science.gov (United States)

    Gottschall, Thomas; Baumgartl, Martin; Sagnier, Aude; Rothhardt, Jan; Jauregui, Cesar; Limpert, Jens; Tünnermann, Andreas

    2012-05-21

    We present a fiber-based laser source for multiplex coherent anti-Stokes Raman scattering (CARS) microscopy. This source is very compact and potentially alignment-free. The corresponding pump and Stokes pulses for the CARS process are generated by degenerate four-wave mixing (FWM) in photonic-crystal fibers. In addition, an ytterbium-doped fiber laser emitting spectrally narrow 100 ps pulses at 1035 nm wavelength serves as pump for the FWM frequency conversion. The FWM process delivers narrow-band pulses at 648 nm and drives a continuum-like spectrum ranging from 700 to 820 nm. With the presented source vibrational resonances with energies between 1200 cm-1 and 3200 cm-1 can be accessed with a resolution of 10 cm-1. Additionally, the temporal characteristics of the FWM output have been investigated by a cross-correlation setup, revealing the suitability of the emitted pulses for CARS microscopy. This work marks a significant step towards a simple and powerful all-fiber, maintenance-free multiplex-CARS source for real-world applications outside a laboratory environment.

  1. Developing Topological Insulator Fiber Based Photon Pairs Source for Ultrafast Optoelectronic Applications

    Science.gov (United States)

    2016-04-01

    DEVELOPING TOPOLOGICAL INSULATOR FIBER BASED PHOTON PAIRS SOURCE FOR ULTRAFAST OPTOELECTRONIC APPLICATIONS NORTHWESTERN UNIVERSITY...REPORT TYPE FINAL TECHNICAL REPORT 3. DATES COVERED (From - To) APRIL 2015 – DEC 2015 4. TITLE AND SUBTITLE DEVELOPING TOPOLOGICAL INSULATOR FIBER BASED...in developing a new source for the production of correlated/entangled photon pairs based on the unique nanolayer properties of topological insulator

  2. Pulsed neutron source based on accelerator-subcritical-assembly

    Energy Technology Data Exchange (ETDEWEB)

    Inoue, Makoto; Noda, Akira; Iwashita, Yoshihisa; Okamoto, Hiromi; Shirai, Toshiyuki [Kyoto Univ., Uji (Japan). Inst. for Chemical Research

    1997-03-01

    A new pulsed neutron source which consists of a 300MeV proton linac and a nuclear fuel subcritical assembly is proposed. The proton linac produces pulsed spallation neutrons, which are multipied by the subcritical assembly. A prototype proton linac that accelerates protons up to 7MeV has been developed and a high energy section of a DAW structure is studied with a power model. Halo formations in high intensity beam are also being studied. (author)

  3. Heavy Ion Injection Into Synchrotrons, Based On Electron String Ion Sources

    CERN Document Server

    Donets, E E; Syresin, E M

    2004-01-01

    A possibility of heavy ions injection into synchrotrons is discussed on the base of two novel ion sources, which are under development JINR during last decade: 1) the electron string ion source (ESIS), which is a modified version of a conventional electron beam ion source (EBIS), working in a reflex mode of operation, and 2) the tubular electron string ion source (TESIS). The Electron String Ion Source "Krion-2" (VBLHE, JINR, Dubna) with an applied confining magnetic field of 3 T was used for injection into the superconducting JINR synchrotron - Nuclotron and during this runs the source provided a high pulse intensity of the highly charged ion beams: Ar16+

  4. X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990

    Science.gov (United States)

    Hoover, Richard B. (Editor); Walker, Arthur B. C., Jr. (Editor)

    1991-01-01

    Topics discussed in this issue include the fabrication of multilayer X-ray/EUV coatings; the design, characterization, and test of multilayer X-ray/EUV coatings; multilayer X-ray/EUV monochromators and imaging microscopes; X-ray/EUV telescopes; the test and calibration performance of X-ray/EUV instruments; XUV/soft X-ray projection lithography; X-ray/EUV space observatories and missions; X-ray/EUV telescopes for solar research; X-ray/EUV polarimetry; X-ray/EUV spectrographs; and X-ray/EUV filters and gratings. Papers are presented on the deposition-controlled uniformity of multilayer mirrors, interfaces in Mo/Si multilayers, the design and analysis of an aspherical multilayer imaging X-ray microscope, recent developments in the production of thin X-ray reflecting foils, and the ultraprecise scanning technology. Consideration is also given to an active sun telescope array, the fabrication and performance at 1.33 nm of a 0.24-micron-period multilayer grating, a cylindrical proportional counter for X-ray polarimetry, and the design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission.

  5. Towards Evidence-Based Understanding of Electronic Data Sources

    DEFF Research Database (Denmark)

    Chen, Lianping; Ali Babar, Muhammad; Zhang, He

    2010-01-01

    Identifying relevant papers from various Electronic Data Sources (EDS) is one of the key activities of conducting these kinds of studies. Hence, the selection of EDS for searching the potentially relevant papers is an important decision, which can affect a study’s coverage of relevant papers...... initial effort towards this end. We propose an initial set of metrics for characterizing the EDS from the perspective of the needs of secondary studies. We explain the usage and benefits of the proposed metrics using the data gathered from two secondary studies. We also tried to synthesize the data from...

  6. Silicon-Based Light Sources for Silicon Integrated Circuits

    Directory of Open Access Journals (Sweden)

    L. Pavesi

    2008-01-01

    Full Text Available Silicon the material per excellence for electronics is not used for sourcing light due to the lack of efficient light emitters and lasers. In this review, after having introduced the basics on lasing, I will discuss the physical reasons why silicon is not a laser material and the approaches to make it lasing. I will start with bulk silicon, then I will discuss silicon nanocrystals and Er3+ coupled silicon nanocrystals where significant advances have been done in the past and can be expected in the near future. I will conclude with an optimistic note on silicon lasing.

  7. Ultrabright Laser-based MeV-class Light Source

    Energy Technology Data Exchange (ETDEWEB)

    Albert, F; Anderson, G; Anderson, S; Bayramian, A; Berry, B; Betts, S; Dawson, J; Ebbers, C; Gibson, D; Hagmann, C; Hall, J; Hartemann, F; Hartouni, E; Heebner, J; Hernandez, J; Johnson, M; Messerly, M; McNabb, D; Phan, H; Pruet, J; Semenov, V; Shverdin, M; Sridharan, A; Tremaine, A; Siders, C W; Barty, C J

    2008-04-02

    We report first light from a novel, new source of 10-ps 0.776-MeV gamma-ray pulses known as T-REX (Thomson-Radiated Extreme X-rays). The MeV-class radiation produced by TREX is unique in the world with respect to its brightness, spectral purity, tunability, pulse duration and laser-like beam character. With T-REX, one can use photons to efficiently probe and excite the isotope-dependent resonant structure of atomic nucleus. This ability will be enabling to an entirely new class of isotope-specific, high resolution imaging and detection capabilities.

  8. Hybrid photoneutron source optimization for electron accelerator-based BNCT

    Science.gov (United States)

    Rahmani, F.; Shahriari, M.

    2010-06-01

    Boron Neutron Capture Therapy (BNCT) is being studied as a possible radiotherapic treatment for some cancer types. Neutron energy for penetrating into tissue should be in the epithermal range. Different methods are used for neutron production. Electron accelerators are an alternative way for producing neutrons in electron-photon-neutron processes. Optimization of electron/photon and photoneutron targets calculations with respect to electron energy, dimension (radius and thickness) and neutron yield were done by MCNPX Monte Carlo code. According to the results, a hybrid photoneutron source including BeD 2 and Tungsten has been introduced.

  9. Polymer and small molecule based hybrid light source

    Science.gov (United States)

    Choong, Vi-En; Choulis, Stelios; Krummacher, Benjamin Claus; Mathai, Mathew; So, Franky

    2010-03-16

    An organic electroluminescent device, includes: a substrate; a hole-injecting electrode (anode) coated over the substrate; a hole injection layer coated over the anode; a hole transporting layer coated over the hole injection layer; a polymer based light emitting layer, coated over the hole transporting layer; a small molecule based light emitting layer, thermally evaporated over the polymer based light emitting layer; and an electron-injecting electrode (cathode) deposited over the electroluminescent polymer layer.

  10. Multiple Chemical Sources Localization Using Virtual Physics-Based Robots with Release Strategy

    OpenAIRE

    Yuli Zhang; Xiaoping Ma; Yanzi Miao

    2015-01-01

    This paper presents a novel method of simultaneously locating chemical sources by a virtual physics-based multirobot system with a release strategy. The proposed release strategy includes setting forbidden area, releasing the robots from declared sources and escaping from it by a rotary force and goal force. This strategy can avoid the robots relocating the same source which has been located by other robots and leading them to move toward other sources. Various turbulent plume environments ar...

  11. Exploration of the Transition Region-Corona Interface With the Multi-Order Solar EUV Spectrograph Project

    Data.gov (United States)

    National Aeronautics and Space Administration — We propose to observe the solar upper transition region and lower corona in Ne VII 46.5 nm with the Multi-Order Solar EUV Spectrograph (MOSES) rocket payload. The...

  12. Uncooled Radiation Hard Large Area SiC X-ray and EUV Detectors and 2D Arrays Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This project seeks to design, fabricate, characterize and commercialize large area, uncooled and radiative hard 4H-SiC EUV ? soft X-ray detectors capable of ultra...

  13. Normal incidence spectrophotometer using high density transmission grating technology and highly efficiency silicon photodiodes for absolute solar EUV irradiance measurements

    Science.gov (United States)

    Ogawa, H. S.; Mcmullin, D.; Judge, D. L.; Korde, R.

    1992-01-01

    New developments in transmission grating and photodiode technology now make it possible to realize spectrometers in the extreme ultraviolet (EUV) spectral region (wavelengths less than 1000 A) which are expected to be virtually constant in their diffraction and detector properties. Time dependent effects associated with reflection gratings are eliminated through the use of free standing transmission gratings. These gratings together with recently developed and highly stable EUV photodiodes have been utilized to construct a highly stable normal incidence spectrophotometer to monitor the variability and absolute intensity of the solar 304 A line. Owing to its low weight and compactness, such a spectrometer will be a valuable tool for providing absolute solar irradiance throughout the EUV. This novel instrument will also be useful for cross-calibrating other EUV flight instruments and will be flown on a series of Hitchhiker Shuttle Flights and on SOHO. A preliminary version of this instrument has been fabricated and characterized, and the results are described.

  14. Characterization of a small railgun-based plasma jet source

    Science.gov (United States)

    Schneider, Maximilian; Adams, Colin; Popescu, Marius; Korsness, Joshua; Sherburne, Michael

    2016-10-01

    Experimental characterization of a small plasma jet source has been undertaken at Virginia Tech's Center for Space Science and Engineering Research (Space@VT). The plasma-armature railgun features a square bore approximately 0.5 × 0.5 cm and a rail length of 10 cm. Fed by an 100 psi- gas manifold and powered by an LC pulse-forming network capable of delivering 100 kA current on timescales of several microseconds, jet velocities in the 10-20 km/s range are predicted. A modular design, the insulators and rails are readily swappable for investigation the interaction of the plasma armature with plasma-facing components fabricated with different materials and geometry. The plasma jet is characterized by a suite of diagnostics including a multichord Mach-Zehnder interferometer, spectrometer, photodiode array, and fast photography. Diagnostics planned for the near future include plasma laser-induced fluorescence and particle energy analyzers. The railgun source described is envisioned as a future platform for basic science experiments on topics ranging from plasma-material interaction to plasma shocks.

  15. Developing a beta source based setup for pixel sensor characterization

    CERN Document Server

    Schouwenberg, Jeroen

    2014-01-01

    The main goal of this project is to provide mono-energetic minimum ionizing electrons from a $^{90}$Sr source using a magnetic monochromator, and thus provide a useful tool for in-lab sensor characterization. The monochromator is calibrated using a setup, with a heavy inorganic scintillator and a PMT, which has been calibrated with a $^{22}$Na gamma source. The average energy of the electrons as a function of the current in the monochromator coil is found to be $1.38\\pm0.01$ keV/mA, taking into consideration the effect of the magnetic field on the signal of the PMT. For integration into the pixel sensor test bench, scintillator-counters (a plastic scintillator connected to a PMT) are used. Their response to the electron energies is observed to follow a saturation curve, which leads to a more identical response for high energetic electrons. A preliminary pixel sensor test bench has been set up and properties such as voltage and discriminator settings have been studied as well as count rates for coincidence cou...

  16. High-Speed Fuses in IGBT based Voltage Source Converters

    DEFF Research Database (Denmark)

    Iov, Florin; Blaabjerg, Frede; Rasmussen, Henrik

    2005-01-01

    The demand for protection of power electronic applications has during the last couple of years increased regarding the high-power IGBT modules. Even with an active protection, a high power IGBT still has a risk of exhibiting a violent rupture in the case of a fault if IGBT fuses do not protect it....... By introducing fuses into voltage source converters a better protection of IGBTs can be achieved. This paper is a complete overview of a research project carried out in cooperation by Aalborg University, Denmark and Cooper Bussmann International. This paper discusses three main issues regarding the IGBT fuse...... protection. First, the problem of adding inductance in the DC-link circuit is treated, second a short discussion of the protection of the IGBT module is done, and finally, the impact of the high frequency loading on the current carrying capability of the fuses is presented....

  17. FEASIBILITY STUDY II OF A MUON BASED NEUTRINO SOURCE.

    Energy Technology Data Exchange (ETDEWEB)

    GALLARDO,J.C.; OZAKI,S.; PALMER,R.B.; ZISMAN,M.

    2001-06-30

    The concept of using a muon storage ring to provide a well characterized beam of muon and electron neutrinos (a Neutrino Factory) has been under study for a number of years now at various laboratories throughout the world. The physics program of a Neutrino Factoryis focused on the relatively unexplored neutrino sector. In conjunction with a detector located a suitable distance from the neutrino source, the facility would make valuable contributions to the study of neutrino masses and lepton mixing. A Neutrino Factory is expected to improve the measurement accuracy of sin{sup 2}(2{theta}{sub 23}) and {Delta}m{sup 2}{sub 32} and provide measurements of sin{sup 2}(2{theta}{sub 13}) and the sign of {Delta}m{sup 2}{sub 32}. It may also be able to measure CP violation in the lepton sector.

  18. A Latent Source Model for Patch-Based Image Segmentation.

    Science.gov (United States)

    Chen, George H; Shah, Devavrat; Golland, Polina

    2015-10-01

    Despite the popularity and empirical success of patch-based nearest-neighbor and weighted majority voting approaches to medical image segmentation, there has been no theoretical development on when, why, and how well these nonparametric methods work. We bridge this gap by providing a theoretical performance guarantee for nearest-neighbor and weighted majority voting segmentation under a new probabilistic model for patch-based image segmentation. Our analysis relies on a new local property for how similar nearby patches are, and fuses existing lines of work on modeling natural imagery patches and theory for nonparametric classification. We use the model to derive a new patch-based segmentation algorithm that iterates between inferring local label patches and merging these local segmentations to produce a globally consistent image segmentation. Many existing patch-based algorithms arise as special cases of the new algorithm.

  19. Pitch and TDOA-Based Localization of Acoustic Sources with Distributed Arrays

    DEFF Research Database (Denmark)

    Hansen, Martin Weiss; Jensen, Jesper Rindom; Christensen, Mads Græsbøll

    2015-01-01

    In this paper, a method for acoustic source localization using distributed microphone arrays based on time-differences of arrival (TDOAs) is presented. The TDOAs are used to estimate the location of an acoustic source using a recently proposed method, based on a 4D parameter space defined by the ...

  20. Dynamically reconfigurable directionality of plasmon-based single photon sources

    DEFF Research Database (Denmark)

    Chen, Yuntian; Lodahl, Peter; Koenderink, A. Femius

    2010-01-01

    We propose a plasmon-based reconfigurable antenna to controllably distribute emission from single quantum emitters in spatially separated channels. Our calculations show that crossed particle arrays can split the stream of photons from a single emitter into multiple narrow beams. We predict...... that beams can be switched on and off by switching host refractive index. The design method is based on engineering the dispersion relations of plasmon chains and is generally applicable to traveling wave antennas. Controllable photon delivery has potential applications in classical and quantum communication....

  1. Adaptive Source Localization Based Station Keeping of Autonomous Vehicles

    KAUST Repository

    Guler, Samet

    2016-10-26

    We study the problem of driving a mobile sensory agent to a target whose location is specied only in terms of the distances to a set of sensor stations or beacons. The beacon positions are unknown, but the agent can continuously measure its distances to them as well as its own position. This problem has two particular applications: (1) capturing a target signal source whose distances to the beacons are measured by these beacons and broadcasted to a surveillance agent, (2) merging a single agent to an autonomous multi-agent system so that the new agent is positioned at desired distances from the existing agents. The problem is solved using an adaptive control framework integrating a parameter estimator producing beacon location estimates, and an adaptive motion control law fed by these estimates to steer the agent toward the target. For location estimation, a least-squares adaptive law is used. The motion control law aims to minimize a convex cost function with unique minimizer at the target location, and is further augmented for persistence of excitation. Stability and convergence analysis is provided, as well as simulation results demonstrating performance and transient behavior.

  2. Silicon nanowire based high brightness, pulsed relativistic electron source

    Directory of Open Access Journals (Sweden)

    Deep Sarkar

    2017-06-01

    Full Text Available We demonstrate that silicon nanowire arrays efficiently emit relativistic electron pulses under irradiation by a high-intensity, femtosecond, and near-infrared laser (∼1018 W/cm2, 25 fs, 800 nm. The nanowire array yields fluxes and charge per bunch that are 40 times higher than those emitted by an optically flat surface, in the energy range of 0.2–0.5 MeV. The flux and charge yields for the nanowires are observed to be directional in nature unlike that for planar silicon. Particle-in-cell simulations establish that such large emission is caused by the enhancement of the local electric fields around a nanowire, which consequently leads to an enhanced absorption of laser energy. We show that the high-intensity contrast (ratio of picosecond pedestal to femtosecond peak of the laser pulse (10−9 is crucial to this large yield. We extend the notion of surface local-field enhancement, normally invoked in low-order nonlinear optical processes like second harmonic generation, optical limiting, etc., to ultrahigh laser intensities. These electron pulses, expectedly femtosecond in duration, have potential application in imaging, material modification, ultrafast dynamics, terahertz generation, and fast ion sources.

  3. Alternative current source based Schottky contact with additional electric field

    Science.gov (United States)

    Mamedov, R. K.; Aslanova, A. R.

    2017-07-01

    Additional electric field (AEF) in the Schottky contacts (SC) that covered the peripheral contact region wide and the complete contact region narrow (as TMBS diode) SC. Under the influence of AEF is a redistribution of free electrons produced at certain temperatures of the semiconductor, and is formed the space charge region (SCR). As a result of the superposition of the electric fields SCR and AEF occurs the resulting electric field (REF). The REF is distributed along a straight line perpendicular to the contact surface, so that its intensity (and potential) has a minimum value on the metal surface and the maximum value at a great distance from the metal surface deep into the SCR. Under the influence of AEF as a sided force the metal becomes negative pole and semiconductor - positive pole, therefore, SC with AEF becomes an alternative current source (ACS). The Ni-nSi SC with different diameters (20-1000 μm) under the influence of the AEF as sided force have become ACS with electromotive force in the order of 0.1-1.0 mV, which are generated the electric current in the range of 10-9-10-7 A, flowing through the external resistance 1000 Ohm.

  4. Overcoming EUV mask blank defects: what we can, and what we should

    Science.gov (United States)

    Jonckheere, Rik

    2017-07-01

    This invited paper reviews progress over the past ten years of contributed effort to the understanding and the mitigation of multilayer defects on the EUV mask blank. These defects are an EUV-specific type of mask defects. Whereas the only true solution is to totally avoid the presence of such ML-defects during blank manufacturing, some level of capability of printability mitigation has been demonstrated, both by absorber compensation repair and by pattern shift. In both cases, it is essential that one can build on a full-proof blank inspection capability, that detects all printable blank defects, at a very low false detection rate, such as by using actinic blank inspection. This capability, together with providing accurate defect location information, establishes an essential prerequisite for their mitigation or avoidance. On the latter, the proposal is made to extend pattern shift to intentional pattern deformation.

  5. Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists

    KAUST Repository

    Jiang, Jing

    2015-03-19

    Ligand stabilized metal oxide nanoparticle resists are promising candidates for EUV lithography due to their high sensitivity for high-resolution patterning and high etching resistance. As ligand exchange is responsible for the patterning mechanism, we systematically studied the influence of ligand structures of metal oxide EUV nanoparticles on their sensitivity and dissolution behavior. ZrO2 nanoparticles were protected with various aromatic ligands with electron withdrawing and electron donating groups. These nanoparticles have lower sensitivity compared to those with aliphatic ligands suggesting the structures of these ligands is more important than their pka on resist sensitivity. The influence of ligand structure was further studied by comparing the nanoparticles’ solubility for a single type ligand to mixtures of ligands. The mixture of nanoparticles showed improved pattern quality. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

  6. Quantitative Chemically-Specific Coherent Diffractive Imaging of Buried Interfaces using a Tabletop EUV Nanoscope

    CERN Document Server

    Shanblatt, Elisabeth R; Gardner, Dennis F; Mancini, Giulia F; Karl, Robert M; Tanksalvala, Michael D; Bevis, Charles S; Vartanian, Victor H; Kapteyn, Henry C; Adams, Daniel E; Murnane, Margaret M

    2016-01-01

    Characterizing buried layers and interfaces is critical for a host of applications in nanoscience and nano-manufacturing. Here we demonstrate non-invasive, non-destructive imaging of buried interfaces using a tabletop, extreme ultraviolet (EUV), coherent diffractive imaging (CDI) nanoscope. Copper nanostructures inlaid in SiO2 are coated with 100 nm of aluminum, which is opaque to visible light and thick enough that neither optical microscopy nor atomic force microscopy can image the buried interfaces. Short wavelength (29 nm) high harmonic light can penetrate the aluminum layer, yielding high-contrast images of the buried structures. Moreover, differences in the absolute reflectivity of the interfaces before and after coating reveal the formation of interstitial diffusion and oxidation layers at the Al-Cu and Al-SiO2 boundaries. Finally, we show that EUV CDI provides a unique capability for quantitative, chemically-specific imaging of buried structures, and the material evolution that occurs at these buried ...

  7. EUV actinic defect inspection and defect printability at the sub-32 nm half pitch

    Energy Technology Data Exchange (ETDEWEB)

    Huh, Sungmin; Kearney, Patrick; Wurm, Stefan; Goodwin, Frank; Han, Hakseung; Goldberg, Kenneth; Mochi, Iacopp; Gullikson, Eric M.

    2009-08-01

    Extreme ultraviolet (EUV) mask blanks with embedded phase defects were inspected with a reticle actinic inspection tool (AIT) and the Lasertec M7360. The Lasertec M7360, operated at SEMA TECH's Mask Blank Development Center (MBDC) in Albany, NY, has a sensitivity to multilayer defects down to 40-45 nm, which is not likely sufficient for mask blank development below the 32 nm half-pitch node. Phase defect printability was simulated to calculate the required defect sensitivity for a next generation blank inspection tool to support reticle development for the sub-32 nm half-pitch technology node. Defect mitigation technology is proposed to take advantage of mask blanks with some defects. This technology will reduce the cost of ownership of EUV mask blanks. This paper will also discuss the kind of infrastructure that will be required for the development and mass production stages.

  8. Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications

    Energy Technology Data Exchange (ETDEWEB)

    Hu, M.H.; Le Guen, K.; Andre, J.M.; Jonnard, P. [UPMC Univ Paris 06, CNRS UMR 7614, Laboratoire Chimie Physique - Matiere Rayonnement, Paris (France); Zhou, S.K.; Li, H.C.; Zhu, J.T.; Wang, Z.S. [Tongji University, Institute of Precision Optical Engineering, Department of Physics, Shanghai (China); Meny, C. [CNRS UMR 7504, Institut de Physique et Chimie des Materiaux de Strasbourg (France); Mahne, N.; Giglia, A. [CNR-IOM Laboratorio TASC, Basovizza, Trieste (Italy); Nannarone, S. [CNR-IOM Laboratorio TASC, Basovizza, Trieste (Italy); Universita di Modenae R.E., Dipartimento Ingegneria Materiali, Modena (Italy); Esteve, I. [Univ. Paris 06 et 07, CNRS UMR 7590, Institut de Mineralogie et de Physique des Milieux Condenses, Paris (France); Walls, M. [Univ. Paris Sud, Laboratoire de Physiques des Solides, CNRS UMR 8502, Orsay (France)

    2012-03-15

    We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400 {sup circle} C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show a good quality of the multilayer structure. The measurements of the EUV reflectivity around 25 nm ({proportional_to}49 eV) indicate that the reflectivity decreases when the annealing temperature increases above 300 {sup circle} C. X-ray emission spectroscopy is performed to determine the chemical state of the Mg atoms within the Mg/Co multilayer. Nuclear magnetic resonance used to determine the chemical state of the Co atoms and scanning electron microscopy images of cross sections of the Mg/Co multilayers reveal changes in the morphology of the stack from an annealing temperature of 305 {sup circle} C. This explains the observed reflectivity loss. (orig.)

  9. Sources, Developments and Directions of Task-Based Language Teaching

    Science.gov (United States)

    Bygate, Martin

    2016-01-01

    This paper provides an outline of the origins, the current shape and the potential directions of task-based language teaching (TBLT) as an approach to language pedagogy. It first offers a brief description of TBLT and considers its origins within language teaching methodology and second language acquisition. It then summarises the current position…

  10. Delineation of seismic source zones based on seismicity parameters ...

    Indian Academy of Sciences (India)

    The spatial variation of rock level peak horizontal acceleration (PHA) and spectral acceleration (Sa) values corresponding to return periods of 475 and 2500 years for the entire study area are presented in this work. The peak ground acceleration (PGA) values at ground surface level were estimated based on different ...

  11. Results from source-based and detector-based calibrations of a CLARREO calibration demonstration system

    Science.gov (United States)

    Angal, Amit; McCorkel, Joel; Thome, Kurt

    2016-09-01

    The Climate Absolute Radiance and Refractivity Observatory (CLARREO) mission is formulated to determine long-term climate trends using SI-traceable measurements. The CLARREO mission will include instruments operating in the reflected solar (RS) wavelength region from 320 nm to 2300 nm. The Solar, Lunar for Absolute Reflectance Imaging Spectroradiometer (SOLARIS) is the calibration demonstration system (CDS) for the reflected solar portion of CLARREO and facilitates testing and evaluation of calibration approaches. The basis of CLARREO and SOLARIS calibration is the Goddard Laser for Absolute Measurement of Response (GLAMR) that provides a radiance-based calibration at reflective solar wavelengths using continuously tunable lasers. SI-traceability is achieved via detector-based standards that, in GLAMR's case, are a set of NIST-calibrated transfer radiometers. A portable version of the SOLARIS, Suitcase SOLARIS is used to evaluate GLAMR's calibration accuracies. The calibration of Suitcase SOLARIS using GLAMR agrees with that obtained from source-based results of the Remote Sensing Group (RSG) at the University of Arizona to better than 5% (k=2) in the 720-860 nm spectral range. The differences are within the uncertainties of the NIST-calibrated FEL lamp-based approach of RSG and give confidence that GLAMR is operating at Suitcase SOLARIS instrument also discussed and the next edition of the SOLARIS instrument (Suitcase SOLARIS- 2) is expected to provide an improved mechanism to further assess GLAMR and CLARREO calibration approaches.

  12. Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

    KAUST Repository

    Chakrabarty, Souvik

    2013-04-01

    DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

  13. Photon flux requirements for EUV reticle imaging microscopy in the 22 and 16 nm nodes

    Energy Technology Data Exchange (ETDEWEB)

    Wintz, D.; Goldberg, K. A.; Mochi, I.; Huh, S.

    2010-03-12

    EUV-wavelength actinic microscopy yields detailed information about EUV mask patterns, architectures, defects, and the performance of defect repair strategies, without the complications of photoresist imaging. The measured aerial image intensity profiles provide valuable feedback to improve mask and lithography system modeling methods. In order to understand the photon-flux-dependent pattern measurement limits of EUV mask-imaging microscopy, we have investigated the effects of shot noise on aerial image linewidth measurements for lines in the 22 and 16-nm generations. Using a simple model of image formation near the resolution limit, we probe the influence of photon shot noise on the measured, apparent line roughness. With this methodology, we arrive at general flux density requirements independent of the specific EUV microscope configurations. Analytical and statistical analysis of aerial image simulations in the 22 and 16-nm generations reveal the trade-offs between photon energy density (controllable with exposure time), effective pixel dimension on the CCO (controlled by the microscope's magnification ratio), and image log slope (ILS). We find that shot-noise-induced linewidth roughness (LWR) varies imersely with the square root of the photon energy density, and is proportional to the imaging magnification ratio. While high magnification is necessary for adequate spatial resolution, for a given flux density, higher magnification ratios have diminishing benefits. With practical imaging parameters, we find that in order to achieve an LWR (3{sigma}) value of 5% of linewidth for dense, 88-nm mask features with 80% aerial image contrast and 13.5-nm effective pixel width (1000x magnification ratio), a peak photon flux of approximately 1400 photons per pixel per exposure is required.

  14. Graphene based superconducting junctions as spin sources for spintronics

    Science.gov (United States)

    Emamipour, Hamidreza

    2018-02-01

    We investigate spin-polarized transport in graphene-based ferromagnet-superconductor junctions within the Blonder-Tinkham-Klapwijk formalism by using spin-polarized Dirac-Bogoliubov-de-Gennes equations. We consider superconductor in spin-singlet s-wave pairing state and ferromagnet is modeled by an exchange field with energy of Ex. We have found that graphene-based junctions can be used to produce highly spin-polarized current in different situations. For example, if we design a junction with high Ex and EF compared to order parameter of superconductor, then one can have a large spin-polarized current which is tunable in magnitude and sign by bias voltage and Ex. Therefore graphene-based superconducting junction can be used in spintronic devices in alternative to conventional junctions or half-metallic ferromagnets. Also, we have found that the calculated spin polarization can be used as a tool to distinguish specular Andreev reflection (SAR) from the conventional Andreev reflection (CAR) such that in the case of CAR, spin polarization in sub-gap region is completely negative which means that spin-down current is greater than spin-up current. When the SAR is dominated, the spin polarization is positive at all bias-voltages, which itself shows that spin-up current is greater than spin-down current.

  15. Influence of pressure on ion energy distribution functions in EUV-induced hydrogen plasmas

    Science.gov (United States)

    van de Ven, T. H. M.; Reefman, P.; de Meijere, C. A.; Banine, V. Y.; Beckers, J.

    2016-09-01

    Next-generation lithography tools currently use Extreme Ultraviolet (EUV) radiation to create even smaller features on computer chips. The high energy photons (92 eV) induce a plasma in the low pressure background gas by photoionization. Industries have realized that these plasmas are of significant importance with respect to machine lifetime because impacting ions affect exposed surfaces. The mass resolved ion energy distribution function (IEDF) is therefore one of the main plasma parameters of interest. In this research an ion mass spectrometer is used to investigate IEDFs of ions impacting on surfaces in EUV-induced plasmas. EUV radiation is focused into a vessel with a low pressure hydrogen environment. Here, photoionization creates free electrons with energies up to 76 eV, which further ionize the background gas. The influence of the pressure on plasma composition and IEDFs has been investigated in the range 0.1-10 Pa. In general the ion fluxes towards the surface increase with pressure. However, above 5 Pa the flux of H2+ is not affected by the increase in pressure due to the balance between the creation of H2+ and the conversion of H2+ to H3+. These results will be used to benchmark plasma scaling models and verify numerical simulations.

  16. Testing the Interstellar Wind Helium Flow Direction with Galileo Euvs Data

    Science.gov (United States)

    Pryor, W. R.; Simmons, K. E.; Ajello, J. M.; Tobiska, W. K.; Retherford, K. D.; Stern, S. A.; Feldman, P. D.; Frisch, P. C.; Bzowski, M.; Grava, C.

    2014-12-01

    Forty years of measurements of the flow of interstellar helium through the heliosphere suggest that variations of the flow direction with time are possible. We will model Galileo Extreme Ultraviolet Spectrometer (EUVS) data to determine the best-fitting flow direction and compare it to values obtained by other spacecraft. The Galileo EUVS (Hord et al., 1992) was mounted on the spinning part of the spacecraft and obtained interstellar wind hydrogen Lyman-alpha 121.6 nm and helium 58.4 nm data on great circles passing near the ecliptic poles during the interplanetary cruise phase of the mission and also during the Jupiter orbital phase of the mission. The Galileo hydrogen cruise data have been previously published (Hord et al., 1991, Pryor et al., 1992; 1996; 2001), but the helium data have not. Our model was previously used by Ajello et al., 1978, 1979 to model Mariner 10 interstellar wind helium data, and by Stern et al., 2012 and Feldman et al., 2012 to model the interplanetary helium background near the moon in Lunar Reconnaissance Orbiter (LRO) Lyman-alpha Mapping Project (LAMP) data. The model has been updated to include recent determinations of daily helium 58.4 nm solar flux variations and helium losses due to EUV photoionization and electron impact ionization.

  17. EUV emission stimulated by use of dual laser pulses from continus liquid microjet targets

    Science.gov (United States)

    Higashiguchi, Takeshi; Rajyaguru, Chirag; Sasaki, Wataru; Kubodera, Shoichi

    2004-11-01

    A continuous water-jet or water-jet mixed with LiF with several tens μm diameter was formed in a vacuum chamber through a small capillary nozzle. Usage of two laser pulses is an efficient way to produce EUV emission, since a density and temperature of a plasma formed by the first laser pulse are regulated by the second laser pulse. By adjusting the delay of the second pulse, one could maximize the EUV emission. A subpicosecond Ti:Sapphire laser at a wavelength of 800 nm produced a maximum energy around 30 mJ. The beam was divided by a Michelson interferometer, which produced two laser pulses with energies of 5 mJ. The pulse duration was adjusted around 300 fs (FWHM). Both beams were focused on a micro-jet using a lens with a focal length of 15 cm. The delay time between the two pulses was varied from 100 to 800 ps by use of an optical delay line. Clear enhancement of the EUV emission yield was observed when the delay between the two pulses was around 500 ps. The experimentally observed delay agrees reasonably well with that of a plasma to expand to its critical density of 10^21 cm-3.

  18. Optical observations of post-discharge phenomena of laser-triggered discharge produced plasma for EUV lithography

    Science.gov (United States)

    Lim, Soowon; Kitajima, Seiya; Lu, Peng; Sakugawa, Takashi; Akiyama, Hidenori; Katsuki, Sunao; Teramoto, Yusuke

    2015-01-01

    This paper reports the dynamic post-discharge phenomena of laser-triggered discharge-produced plasmas (LTDPP) for extreme ultraviolet lithography (EUVL) sources. A pulsed laser was focused on the high-voltage tin cathode surface to form tin vapor jet across a 5 mm long anode-cathode gap, which leads to the electrical breakdown. The post-discharge phenomena were observed using both of the Schlieren method and high-speed camera. Schlieren images show the dynamic evolution of the discharge plasma and the development of tin droplets. Visible emission from the plasma lasted for more than 1 µs after the current stopped. The droplets emerged from the cathode approximately 100 µs after discharge and spread throughout the electrodes gap. Various sizes of droplets stagnate in the gap for milliseconds. The subsequent laser pulse and voltage application show an interaction between the droplets and the subsequent discharge. The subsequent laser pulse evaporates not only the cathode surface but also the droplets, which influence the tin vapor distribution in the gap. This uncertain vapor distribution affects the formation process of microplasmas that emit EUV.

  19. Optimization Design and Simulation of a Multi-Source Energy Harvester Based on Solar and Radioisotope Energy Sources

    Directory of Open Access Journals (Sweden)

    Hao Li

    2016-12-01

    Full Text Available A novel multi-source energy harvester based on solar and radioisotope energy sources is designed and simulated in this work. We established the calculation formulas for the short-circuit current and open-circuit voltage, and then studied and analyzed the optimization thickness of the semiconductor, doping concentration, and junction depth with simulation of the transport process of β particles in a semiconductor material using the Monte Carlo simulation program MCNP (version 5, Radiation Safety Information Computational Center, Oak Ridge, TN, USA. In order to improve the efficiency of converting solar light energy into electric power, we adopted PC1D (version 5.9, University of New South Wales, Sydney, Australia to optimize the parameters, and selected the best parameters for converting both the radioisotope energy and solar energy into electricity. The results concluded that the best parameters for the multi-source energy harvester are as follows: Na is 1 × 1019 cm−3, Nd is 3.8 × 1016 cm−3, a PN junction depth of 0.5 μm (using the 147Pm radioisotope source, and so on. Under these parameters, the proposed harvester can achieve a conversion efficiency of 5.05% for the 147Pm radioisotope source (with the activity of 9.25 × 108 Bq and 20.8% for solar light radiation (AM1.5. Such a design and parameters are valuable for some unique micro-power fields, such as applications in space, isolated terrestrial applications, and smart dust in battlefields.

  20. Small Area Model-Based Estimators Using Big Data Sources

    Directory of Open Access Journals (Sweden)

    Marchetti Stefano

    2015-06-01

    Full Text Available The timely, accurate monitoring of social indicators, such as poverty or inequality, on a finegrained spatial and temporal scale is a crucial tool for understanding social phenomena and policymaking, but poses a great challenge to official statistics. This article argues that an interdisciplinary approach, combining the body of statistical research in small area estimation with the body of research in social data mining based on Big Data, can provide novel means to tackle this problem successfully. Big Data derived from the digital crumbs that humans leave behind in their daily activities are in fact providing ever more accurate proxies of social life. Social data mining from these data, coupled with advanced model-based techniques for fine-grained estimates, have the potential to provide a novel microscope through which to view and understand social complexity. This article suggests three ways to use Big Data together with small area estimation techniques, and shows how Big Data has the potential to mirror aspects of well-being and other socioeconomic phenomena.

  1. Source and listener directivity for interactive wave-based sound propagation.

    Science.gov (United States)

    Mehra, Ravish; Antani, Lakulish; Kim, Sujeong; Manocha, Dinesh

    2014-04-01

    We present an approach to model dynamic, data-driven source and listener directivity for interactive wave-based sound propagation in virtual environments and computer games. Our directional source representation is expressed as a linear combination of elementary spherical harmonic (SH) sources. In the preprocessing stage, we precompute and encode the propagated sound fields due to each SH source. At runtime, we perform the SH decomposition of the varying source directivity interactively and compute the total sound field at the listener position as a weighted sum of precomputed SH sound fields. We propose a novel plane-wave decomposition approach based on higher-order derivatives of the sound field that enables dynamic HRTF-based listener directivity at runtime. We provide a generic framework to incorporate our source and listener directivity in any offline or online frequency-domain wave-based sound propagation algorithm. We have integrated our sound propagation system in Valve's Source game engine and use it to demonstrate realistic acoustic effects such as sound amplification, diffraction low-passing, scattering, localization, externalization, and spatial sound, generated by wave-based propagation of directional sources and listener in complex scenarios. We also present results from our preliminary user study.

  2. Fuel-Cell Power Source Based on Onboard Rocket Propellants

    Science.gov (United States)

    Ganapathi, Gani; Narayan, Sri

    2010-01-01

    The use of onboard rocket propellants (dense liquids at room temperature) in place of conventional cryogenic fuel-cell reactants (hydrogen and oxygen) eliminates the mass penalties associated with cryocooling and boil-off. The high energy content and density of the rocket propellants will also require no additional chemical processing. For a 30-day mission on the Moon that requires a continuous 100 watts of power, the reactant mass and volume would be reduced by 15 and 50 percent, respectively, even without accounting for boiloff losses. The savings increase further with increasing transit times. A high-temperature, solid oxide, electrolyte-based fuel-cell configuration, that can rapidly combine rocket propellants - both monopropellant system with hydrazine and bi-propellant systems such as monomethyl hydrazine/ unsymmetrical dimethyl hydrazine (MMH/UDMH) and nitrogen tetroxide (NTO) to produce electrical energy - overcomes the severe drawbacks of earlier attempts in 1963-1967 of using fuel reforming and aqueous media. The electrical energy available from such a fuel cell operating at 60-percent efficiency is estimated to be 1,500 Wh/kg of reactants. The proposed use of zirconia-based oxide electrolyte at 800-1,000 C will permit continuous operation, very high power densities, and substantially increased efficiency of conversion over any of the earlier attempts. The solid oxide fuel cell is also tolerant to a wide range of environmental temperatures. Such a system is built for easy refueling for exploration missions and for the ability to turn on after several years of transit. Specific examples of future missions are in-situ landers on Europa and Titan that will face extreme radiation and temperature environments, flyby missions to Saturn, and landed missions on the Moon with 14 day/night cycles.

  3. On the limit of neutron fluxes in the fission-based pulsed neutron sources

    Science.gov (United States)

    Aksenov, V. L.; Ananiev, V. D.; Komyshev, G. G.; Rogov, A. D.; Shabalin, E. P.

    2017-09-01

    The upper limit of the density of the thermal neutron flux from pulsed sources based on the fission reaction is established. Three types of sources for research on ejected beams are considered: a multiplying target of the proton accelerator (a booster), a booster with the reactivity modulation (a superbooster), and a pulsing reactor. Comparison with other high-flux sources is carried out. The investigation has been performed at the Frank Laboratory of Neutron Physics of JINR.

  4. An Impedance-Based Stability Analysis Method for Paralleled Voltage Source Converters

    DEFF Research Database (Denmark)

    Wang, Xiongfei; Blaabjerg, Frede; Loh, Poh Chiang

    2014-01-01

    is assessed based on a series of Nyquist diagrams drawn for the terminal impedance of each converter. Thus, the effect of the right half-plane zeros of terminal impedances in the derivation of impedance ratio for paralleled source-source converters is avoided. The interaction between the terminal impedance......This paper analyses the stability of paralleled voltage source converters in AC distributed power systems. An impedance-based stability analysis method is presented based on the Nyquist criterion for multiloop system. Instead of deriving the impedance ratio as usual, the system stability...

  5. A room temperature light source based on silicon nanowires

    Energy Technology Data Exchange (ETDEWEB)

    Lo Faro, M.J. [CNR-IPCF, Istituto per i Processi Chimico-Fisici, V. le F. Stagno D' Alcontres 37, 98158 Messina (Italy); MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Dipartimento di Fisica e Astronomia, Università di Catania, Via Santa Sofia 64, 95123 Catania (Italy); D' Andrea, C. [MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Messina, E.; Fazio, B. [CNR-IPCF, Istituto per i Processi Chimico-Fisici, V. le F. Stagno D' Alcontres 37, 98158 Messina (Italy); Musumeci, P. [Dipartimento di Fisica e Astronomia, Università di Catania, Via Santa Sofia 64, 95123 Catania (Italy); Franzò, G. [MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Gucciardi, P.G.; Vasi, C. [CNR-IPCF, Istituto per i Processi Chimico-Fisici, V. le F. Stagno D' Alcontres 37, 98158 Messina (Italy); Priolo, F. [MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Dipartimento di Fisica e Astronomia, Università di Catania, Via Santa Sofia 64, 95123 Catania (Italy); Scuola Superiore di Catania, Via Valdisavoia 9, 95123 Catania (Italy); Iacona, F. [MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Irrera, A., E-mail: irrera@me.cnr.it [CNR-IPCF, Istituto per i Processi Chimico-Fisici, V. le F. Stagno D' Alcontres 37, 98158 Messina (Italy)

    2016-08-31

    We synthesized ultrathin Si nanowires (NWs) by metal assisted chemical wet etching, using a very thin discontinuous Au layer as precursor for the process. A bright room temperature emission in the visible range due to electron–hole recombination in quantum confined Si NWs is reported. A single walled carbon nanotube (CNT) suspension was prepared and dispersed in Si NW samples. The hybrid Si NW/CNT system exhibits a double emission at room temperature, both in the visible (due to Si NWs) and the IR (due to CNTs) range, thus demonstrating the realization of a low-cost material with promising perspectives for applications in Si-based photonics. - Highlights: • Synthesis of ultrathin Si nanowires (NWs) by metal-assisted chemical etching • Synthesis of NW/carbon nanotube (CNT) hybrid systems • Structural characterization of Si NWs and Si NW/CNT • Room temperature photoluminescence (PL) properties of Si NWs and of Si NW/CNT • Tuning of the PL properties of the Si NW/CNT hybrid system.

  6. Lithium target for accelerator based BNCT neutron source: Influence by the proton irradiation on lithium

    Science.gov (United States)

    Fujii, R.; Imahori, Y.; Nakakmura, M.; Takada, M.; Kamada, S.; Hamano, T.; Hoshi, M.; Sato, H.; Itami, J.; Abe, Y.; Fuse, M.

    2012-12-01

    The neutron source for Boron Neutron Capture Therapy (BNCT) is in the transition stage from nuclear reactor to accelerator based neutron source. Generation of low energy neutron can be achieved by 7Li (p, n) 7Be reaction using accelerator based neutron source. Development of small-scale and safe neutron source is within reach. The melting point of lithium that is used for the target is low, and durability is questioned for an extended use at a high current proton beam. In order to test its durability, we have irradiated lithium with proton beam at the same level as the actual current density, and found no deterioration after 3 hours of continuous irradiation. As a result, it is suggested that lithium target can withstand proton irradiation at high current, confirming suitability as accelerator based neutron source for BNCT.

  7. Validation of Earth atmosphere models using solar EUV observations from the CORONAS and PROBA2 satellites in occultation mode

    Science.gov (United States)

    Slemzin, Vladimir; Ulyanov, Artyom; Gaikovich, Konstantin; Kuzin, Sergey; Pertsov, Andrey; Berghmans, David; Dominique, Marie

    2016-02-01

    Aims: Knowledge of properties of the Earth's upper atmosphere is important for predicting the lifetime of low-orbit spacecraft as well as for planning operation of space instruments whose data may be distorted by atmospheric effects. The accuracy of the models commonly used for simulating the structure of the atmosphere is limited by the scarcity of the observations they are based on, so improvement of these models requires validation under different atmospheric conditions. Measurements of the absorption of the solar extreme ultraviolet (EUV) radiation in the upper atmosphere below 500 km by instruments operating on low-Earth orbits (LEO) satellites provide efficient means for such validation as well as for continuous monitoring of the upper atmosphere and for studying its response to the solar and geomagnetic activity. Method: This paper presents results of measurements of the solar EUV radiation in the 17 nm wavelength band made with the SPIRIT and TESIS telescopes on board the CORONAS satellites and the SWAP telescope on board the PROBA2 satellite in the occulted parts of the satellite orbits. The transmittance profiles of the atmosphere at altitudes between 150 and 500 km were derived from different phases of solar activity during solar cycles 23 and 24 in the quiet state of the magnetosphere and during the development of a geomagnetic storm. We developed a mathematical procedure based on the Tikhonov regularization method for solution of ill-posed problems in order to retrieve extinction coefficients from the transmittance profiles. The transmittance profiles derived from the data and the retrieved extinction coefficients are compared with simulations carried out with the NRLMSISE-00 atmosphere model maintained by Naval Research Laboratory (USA) and the DTM-2013 model developed at CNES in the framework of the FP7 project ATMOP. Results: Under quiet and slightly disturbed magnetospheric conditions during high and low solar activity the extinction coefficients

  8. Validation of Earth atmosphere models using solar EUV observations from the CORONAS and PROBA2 satellites in occultation mode

    Directory of Open Access Journals (Sweden)

    Slemzin Vladimir

    2016-01-01

    Full Text Available Aims: Knowledge of properties of the Earth’s upper atmosphere is important for predicting the lifetime of low-orbit spacecraft as well as for planning operation of space instruments whose data may be distorted by atmospheric effects. The accuracy of the models commonly used for simulating the structure of the atmosphere is limited by the scarcity of the observations they are based on, so improvement of these models requires validation under different atmospheric conditions. Measurements of the absorption of the solar extreme ultraviolet (EUV radiation in the upper atmosphere below 500 km by instruments operating on low-Earth orbits (LEO satellites provide efficient means for such validation as well as for continuous monitoring of the upper atmosphere and for studying its response to the solar and geomagnetic activity. Method: This paper presents results of measurements of the solar EUV radiation in the 17 nm wavelength band made with the SPIRIT and TESIS telescopes on board the CORONAS satellites and the SWAP telescope on board the PROBA2 satellite in the occulted parts of the satellite orbits. The transmittance profiles of the atmosphere at altitudes between 150 and 500 km were derived from different phases of solar activity during solar cycles 23 and 24 in the quiet state of the magnetosphere and during the development of a geomagnetic storm. We developed a mathematical procedure based on the Tikhonov regularization method for solution of ill-posed problems in order to retrieve extinction coefficients from the transmittance profiles. The transmittance profiles derived from the data and the retrieved extinction coefficients are compared with simulations carried out with the NRLMSISE-00 atmosphere model maintained by Naval Research Laboratory (USA and the DTM-2013 model developed at CNES in the framework of the FP7 project ATMOP. Results: Under quiet and slightly disturbed magnetospheric conditions during high and low solar activity the

  9. Design of a neutrino source based on beta beams

    Directory of Open Access Journals (Sweden)

    E. Wildner

    2014-07-01

    Full Text Available “Beta beams” produce collimated pure electron (antineutrino beams by accelerating beta active ions to high energies and having them decay in a racetrack shaped storage ring of 7 km circumference, the decay ring. EUROnu beta beams are based on CERN infrastructures and existing machines. Using existing machines may be an advantage for the cost evaluation, but will also constrain the physics performance. The isotope pair of choice for the beta beam is ^{6}He and ^{18}Ne. However, before the EUROnu studies one of the required isotopes, ^{18}Ne, could not be produced in rates that satisfy the needs for physics of the beta beam. Therefore, studies of alternative beta emitters, ^{8}Li and ^{8}B, with properties interesting for a beta beam have been proposed and have been studied within EUROnu. These alternative isotopes could be produced by using a small storage ring, in which the beam traverses a target, creating the ^{8}Li and ^{8}B isotopes. This production ring, the injection linac and the target system have been evaluated. Measurements of the cross section of the reactions to produce the beta beam isotopes show interesting results. A device to collect the produced isotopes from the target has been developed and tested. However, the yields of ^{8}Li and ^{8}B, using the production ring for production of ^{8}Li and ^{8}B, is not yet, according to simulations, giving the rates of isotopes that would be needed. Therefore, a new method of producing the ^{18}Ne isotope has been developed and tested giving good production rates. A 60 GHz ECRIS prototype, the first in the world, was developed and tested for ion production with contributions from EUROnu. The decay ring lattices for the ^{8}Li and ^{8}B have been developed and the lattice for ^{6}He and ^{18}Ne has been optimized to ensure the high intensity ion beam stability.

  10. Taurine supplemented plant protein based diets with alternative lipid sources for juvenile sea bream, sparus aurata

    Science.gov (United States)

    Two lipid sources were evaluated as fish oil replacements in fishmeal free, plant protein based diets for juvenile gilthead sea bream, Sparus aurata. A twelve week feeding study was undertaken to examine the performance of fish fed the diets with different sources of essential fatty acids (canola o...

  11. Tomsk Polytechnic University cyclotron as a source for neutron based cancer treatment.

    Science.gov (United States)

    Lisin, V A; Bogdanov, A V; Golovkov, V M; Musabaeva, L I; Sukhikh, L G; Verigin, D A

    2014-02-01

    In this paper we present our cyclotron based neutron source with average energy 6.3 MeV generated during the 13.6 MeV deuterons interactions with beryllium target, neutron field dosimetry, and dosimetry of attendant gamma fields. We also present application of our neutron source for cancer treatment.

  12. Assessment of air, water and land-based sources of pollution in the ...

    African Journals Online (AJOL)

    A quantitative assessment of air, water and land-based sources of pollution to the coastal zone of the Accra-Tema Metropolitan Area of Ghana was conducted by making an emission inventory from information on industrial, commercial and domestic activities. Three sources of air pollution were analysed, viz, emission from ...

  13. Novel X-ray source based on a tabletop synchrotron and its unique features

    CERN Document Server

    Yamada, H

    2003-01-01

    Novel X-ray source is based on a smallest synchrotron named MIRRORCLE using a collision of electron beam and a tiny target. It is demonstrated that the brightness is comparable to SR, source size can be a nano-scale, the spectrum is very flat and dominated by hard components, and it is highly coherent.

  14. High-Efficiency Nitride-Base Photonic Crystal Light Sources

    Energy Technology Data Exchange (ETDEWEB)

    James Speck; Evelyn Hu; Claude Weisbuch; Yong-Seok Choi; Kelly McGroddy; Gregor Koblmuller; Elison Matioli; Elizabeth Rangel; Fabian Rol; Dobri Simeonov

    2010-01-31

    The research activities performed in the framework of this project represent a major breakthrough in the demonstration of Photonic Crystals (PhC) as a competitive technology for LEDs with high light extraction efficiency. The goals of the project were to explore the viable approaches to manufacturability of PhC LEDS through proven standard industrial processes, establish the limits of light extraction by various concepts of PhC LEDs, and determine the possible advantages of PhC LEDs over current and forthcoming LED extraction concepts. We have developed three very different geometries for PhC light extraction in LEDs. In addition, we have demonstrated reliable methods for their in-depth analysis allowing the extraction of important parameters such as light extraction efficiency, modal extraction length, directionality, internal and external quantum efficiency. The information gained allows better understanding of the physical processes and the effect of the design parameters on the light directionality and extraction efficiency. As a result, we produced LEDs with controllable emission directionality and a state of the art extraction efficiency that goes up to 94%. Those devices are based on embedded air-gap PhC - a novel technology concept developed in the framework of this project. They rely on a simple and planar fabrication process that is very interesting for industrial implementation due to its robustness and scalability. In fact, besides the additional patterning and regrowth steps, the process is identical as that for standard industrially used p-side-up LEDs. The final devices exhibit the same good electrical characteristics and high process yield as a series of test standard LEDs obtained in comparable conditions. Finally, the technology of embedded air-gap patterns (PhC) has significant potential in other related fields such as: increasing the optical mode interaction with the active region in semiconductor lasers; increasing the coupling of the incident

  15. Young adults' sources of contraceptive information: variations based on demographic characteristics and sexual risk behaviors.

    Science.gov (United States)

    Khurana, Atika; Bleakley, Amy

    2015-02-01

    Sexual information sources used by young adults can influence their contraceptive knowledge and behaviors, yet little is known about sources most frequently used by young adults, especially by groups with histories of sexual risk involvement. Nationally representative data from 1800 unmarried young adults, aged 18-29 years, were analyzed to (1) examine the sources of contraceptive information most frequently used by young adults and (2) assess variations (if any) in source use based on demographic characteristics and sexual risk history (determined based on past sexual behaviors). "Doctors/nurses" was the most frequently used contraceptive information source reported by young adults. Significant variations existed in source use based on demographic characteristics and sexual risk history. Females were more likely to obtain contraceptive information from health care professionals, whereas males were more likely to report friends, partners, internet and television/radio as their frequently used source. Young adults with a sexual risk history were more likely to rely on doctors/nurses and less likely to report friends and internet as their frequently used source than those without a sexual risk history. Receiving contraceptive information from doctors/nurses was associated with greater accuracy in knowledge about contraceptive use and efficacy as compared to all other sources. Young adults' use of specific contraceptive information sources can vary based on their demographic characteristics and sexual risk involvement. Future research should identify better strategies to connect young adults, especially young males, with sexual risk histories to more reliable sources of information. Copyright © 2015 Elsevier Inc. All rights reserved.

  16. High power and high repetition solid state laser for EUV lithography

    Energy Technology Data Exchange (ETDEWEB)

    Fujita, H.; Mitra, A.; Wang, T. and the others [Osaka Univ., Osaka (Japan)

    2004-07-01

    We have been developing a high repetition (5 kHz) and high power (5kW) Nd:YAG laser system for EUV lithography. Key subjects are (1) reliable front-end, (2) uniform and high density pumping of main amplifier rods, and (3) compensation of thermal effects. A stable and reliable front-end based on fiber lasers has been developed. As a cw oscillator using Yb-doped silica fiber operates single longitudinal mode at 1030 nm to 1080nm, various laser materials (Yb:YAG, Nd:YLF, Nd:YAG, Nd:YAP, etc) can be used as main laser medium. A fast LN EO modulator switches out arbitrary pulse shape with response time of 100 ps. Laser pulses from the modulator are amplified by 3 stage fiber amplifiers up to 1 J. We will focus our efforts to attain 1 mJ output from the fiber front-end. Output pulses from the front-end are amplified to 100 mJ level by two 4-mm rod amplifiers (Nd:YAG) and two 6-mm rod amplifiers. Main amplifier chain consists of eight 12-mm rod amplifiers pumped by cw laser diodes. Total output power of the laser diodes is 28.8 kW. Double pass geometry is required to get enough gain and to compensate thermal effects. Spatial filters are installed to adjust thermal lens in the amplifiers and to send an image into just the center of the amplifiers. Ninty degree rotators and faraday rotators are installed in order to compensate thermal birefringence. A test amplifier module was made for investigation on uniform pumping, thermal effects, gain properties, and so on. Six laser diode modules with 4.5 kW total output power are installed in symmetric configuration. Active medium is Nd:YAG rod with 0.6% doping. Diameter and length of the rod are 12 mm and 150 mm, respectively. Peak gain of 1.67 was obtained at 4.2 kW pumping power and 200s pumping duration. Pumping uniformity was measured by both gain distribution and spontaneous emission from the laser rod. Fairly good uniformity was achieved by adjusting pumping geometry. Detail system analysis suggests that 8 amplifier modules

  17. Absolute detector-based spectrally tunable radiant source using digital micromirror device and supercontinuum fiber laser.

    Science.gov (United States)

    Li, Zhigang; Wang, Xiaoxu; Zheng, Yuquan; Li, Futian

    2017-06-10

    High-accuracy absolute detector-based spectroradiometric calibration techniques traceable to cryogenic absolute radiometers have made progress rapidly in recent decades under the impetus of atmospheric quantitative spectral remote sensing. A high brightness spectrally tunable radiant source using a supercontinuum fiber laser and a digital micromirror device (DMD) has been developed to meet demands of spectroradiometric calibrations for ground-based, aeronautics-based, and aerospace-based remote sensing instruments and spectral simulations of natural scenes such as the sun and atmosphere. Using a supercontinuum fiber laser as a radiant source, the spectral radiance of the spectrally tunable radiant source is 20 times higher than the spectrally tunable radiant source using conventional radiant sources such as tungsten halogen lamps, xenon lamps, or LED lamps, and the stability is better than ±0.3%/h. Using a DMD, the spectrally tunable radiant source possesses two working modes. In narrow-band modes, it is calibrated by an absolute detector, and in broad-band modes, it can calibrate for remote sensing instrument. The uncertainty of the spectral radiance of the spectrally tunable radiant source is estimated at less than 1.87% at 350 nm to 0.85% at 750 nm, and compared to only standard lamp-based calibration, a greater improvement is gained.

  18. Microdischarge Array Flexible Light Source for High-Efficiency Irradiation of Spaced-Based Crops Project

    Data.gov (United States)

    National Aeronautics and Space Administration — It is desirable to develop a high-efficiency lighting source for large-area irradiation of space-based crops. The key requirements for such a system include high...

  19. Open-Source web-based geographical information system for health exposure assessment

    DEFF Research Database (Denmark)

    Evans, Barry; Sabel, Clive E

    2012-01-01

    This paper presents the design and development of an open source web-based Geographical Information System allowing users to visualise, customise and interact with spatial data within their web browser. The developed application shows that by using solely Open Source software it was possible to d...... to develop a customisable web based GIS application that provides functions necessary to convey health and environmental data to experts and non-experts alike without the requirement of proprietary software....

  20. Open-Source web-based geographical information system for health exposure assessment

    Directory of Open Access Journals (Sweden)

    Evans Barry

    2012-01-01

    Full Text Available Abstract This paper presents the design and development of an open source web-based Geographical Information System allowing users to visualise, customise and interact with spatial data within their web browser. The developed application shows that by using solely Open Source software it was possible to develop a customisable web based GIS application that provides functions necessary to convey health and environmental data to experts and non-experts alike without the requirement of proprietary software.

  1. An Emulated PV Source Based on an Unilluminated Solar Panel and DC Power Supply

    Directory of Open Access Journals (Sweden)

    Zhongfu Zhou

    2017-12-01

    Full Text Available This paper provides a review on various PV simulator technologies as well as presents a novel equivalent photovoltaic (PV source that was constructed by using un-illuminated solar panels and a DC power supply that operates in current source mode. The constructed PV source was used for testing photovoltaic converters and various maximum power point tracking (MPPT algorithms required for capturing the maximum possible output power. The mathematical model and electrical characteristics of the constructed PV source were defined and analyzed in detail in the paper. The constructed PV source has the advantages of high bandwidth over the switching circuit based PV simulators. The constructed PV source has been used for testing various power electronics converters and various control techniques effectively in laboratory environments for researchers and university students.

  2. Accuracy-preserving source term quadrature for third-order edge-based discretization

    Science.gov (United States)

    Nishikawa, Hiroaki; Liu, Yi

    2017-09-01

    In this paper, we derive a family of source term quadrature formulas for preserving third-order accuracy of the node-centered edge-based discretization for conservation laws with source terms on arbitrary simplex grids. A three-parameter family of source term quadrature formulas is derived, and as a subset, a one-parameter family of economical formulas is identified that does not require second derivatives of the source term. Among the economical formulas, a unique formula is then derived that does not require gradients of the source term at neighbor nodes, thus leading to a significantly smaller discretization stencil for source terms. All the formulas derived in this paper do not require a boundary closure, and therefore can be directly applied at boundary nodes. Numerical results are presented to demonstrate third-order accuracy at interior and boundary nodes for one-dimensional grids and linear triangular/tetrahedral grids over straight and curved geometries.

  3. Projection-pursuit-based method for blind separation of nonnegative sources.

    Science.gov (United States)

    Yang, Zuyuan; Xiang, Yong; Rong, Yue; Xie, Shengli

    2013-01-01

    This paper presents a projection pursuit (PP) based method for blind separation of nonnegative sources. First, the available observation matrix is mapped to construct a new mixing model, in which the inaccessible source matrix is normalized to be column-sum-to-1. Then, the PP method is proposed to solve this new model, where the mixing matrix is estimated column by column through tracing the projections to the mapped observations in specified directions, which leads to the recovery of the sources. The proposed method is much faster than Chan's method, which has similar assumptions to ours, due to the usage of optimal projection. It is also more advantageous in separating cross-correlated sources than the independence- and uncorrelation-based methods, as it does not employ any statistical information of the sources. Furthermore, the new method does not require the mixing matrix to be nonnegative. Simulation results demonstrate the superior performance of our method.

  4. Efficient fiber-coupled single-photon sources based on quantum dots

    DEFF Research Database (Denmark)

    Daveau, Raphaël Sura

    This thesis presents the study of solid-state quantum emitters in two dierent forms. The rst part of the thesis deals with quantum dot based single-photon sources with an emphasis on ecient photon extraction into an optical ber. The second part of the thesis covers a theoretical study of optical...... refrigeration with coupled quantum wells. Many photonic quantum information processing applications would benet from a highbrightness, ber-coupled source of triggered single photons. This thesis presents a study of such sources based on quantum dots coupled to unidirectional photonic-crystal waveguide devices...

  5. An Exact Model-Based Method for Near-Field Sources Localization with Bistatic MIMO System

    OpenAIRE

    Singh, Parth Raj; Wang, Yide; Charg?, Pascal

    2017-01-01

    In this paper, we propose an exact model-based method for near-field sources localization with a bistatic multiple input, multiple output (MIMO) radar system, and compare it with an approximated model-based method. The aim of this paper is to propose an efficient way to use the exact model of the received signals of near-field sources in order to eliminate the systematic error introduced by the use of approximated model in most existing near-field sources localization techniques. The proposed...

  6. Current status and future perspectives of accelerator-based x-ray light sources

    Science.gov (United States)

    Tanaka, Takashi

    2017-09-01

    State-of-the-art x-ray light sources are nowadays based on large-scale electron accelerators, because the synchrotron radiation (SR) and x-ray free electron laser (XFEL) radiation generated by high-energy electron beams have many advantages over other alternatives in terms of the wavelength tunability, high brightness and flux, high coherence, flexible polarization states, and so on. This is the reason why SR and XFEL light sources have largely contributed to the evolution of x-ray science. This paper reviews the current status of such accelerator-based x-ray light source facilities and discusses their future perspectives.

  7. Demonstration of defect free EUV mask for 22nm NAND flash contact layer using electron beam inspection system

    Science.gov (United States)

    Shimomura, Takeya; Kawashima, Satoshi; Inazuki, Yuichi; Abe, Tsukasa; Takikawa, Tadahiko; Mohri, Hiroshi; Hayashi, Naoya; Wang, Fei; Ma, Long Eric; Zhao, Yan; Kuan, Chiyan; Xiao, Hong; Jau, Jack

    2011-04-01

    Fabrication of defect free EUV masks including their inspection is the most critical challenge for implementing EUV lithography into semiconductor high volume manufacturing (HVM) beyond 22nm half-pitch (HP) node. The contact to bit-line (CB) layers of NAND flash devices are the most likely the first lithography layers that EUV will be employed for manufacturing due to the aggressive scaling and the difficulty for making the pattern with the current ArF lithography. To assure the defect free EUV mask, we have evaluated electron beam inspection (EBI) system eXplore™ 5200 developed by Hermes Microvision, Inc. (HMI) [1]. As one knows, the main issue of EBI system is the low throughput. To solve this challenge, a function called Lightning Scan™ mode has been recently developed and installed in the system, which allows the system to only inspect the pattern areas while ignoring blanket areas, thus dramatically reduced the overhead time and enable us to inspect CB layers of NAND Flash device with much higher throughput. In this present work, we compared the Lightning scan mode with Normal scan mode on sensitivity and throughput. We found out the Lightning scan mode can improve throughput by a factor of 10 without any sacrifices of sensitivity. Furthermore, using the Lightning scan mode, we demonstrated the possibility to fabricate the defect free EUV masks with moderate inspection time.

  8. An incentive-based source separation model for sustainable municipal solid waste management in China.

    Science.gov (United States)

    Xu, Wanying; Zhou, Chuanbin; Lan, Yajun; Jin, Jiasheng; Cao, Aixin

    2015-05-01

    Municipal solid waste (MSW) management (MSWM) is most important and challenging in large urban communities. Sound community-based waste management systems normally include waste reduction and material recycling elements, often entailing the separation of recyclable materials by the residents. To increase the efficiency of source separation and recycling, an incentive-based source separation model was designed and this model was tested in 76 households in Guiyang, a city of almost three million people in southwest China. This model embraced the concepts of rewarding households for sorting organic waste, government funds for waste reduction, and introducing small recycling enterprises for promoting source separation. Results show that after one year of operation, the waste reduction rate was 87.3%, and the comprehensive net benefit under the incentive-based source separation model increased by 18.3 CNY tonne(-1) (2.4 Euros tonne(-1)), compared to that under the normal model. The stakeholder analysis (SA) shows that the centralized MSW disposal enterprises had minimum interest and may oppose the start-up of a new recycling system, while small recycling enterprises had a primary interest in promoting the incentive-based source separation model, but they had the least ability to make any change to the current recycling system. The strategies for promoting this incentive-based source separation model are also discussed in this study. © The Author(s) 2015.

  9. Stability metrics for multi-source biomedical data based on simplicial projections from probability distribution distances.

    Science.gov (United States)

    Sáez, Carlos; Robles, Montserrat; García-Gómez, Juan M

    2017-02-01

    Biomedical data may be composed of individuals generated from distinct, meaningful sources. Due to possible contextual biases in the processes that generate data, there may exist an undesirable and unexpected variability among the probability distribution functions (PDFs) of the source subsamples, which, when uncontrolled, may lead to inaccurate or unreproducible research results. Classical statistical methods may have difficulties to undercover such variabilities when dealing with multi-modal, multi-type, multi-variate data. This work proposes two metrics for the analysis of stability among multiple data sources, robust to the aforementioned conditions, and defined in the context of data quality assessment. Specifically, a global probabilistic deviation and a source probabilistic outlyingness metrics are proposed. The first provides a bounded degree of the global multi-source variability, designed as an estimator equivalent to the notion of normalized standard deviation of PDFs. The second provides a bounded degree of the dissimilarity of each source to a latent central distribution. The metrics are based on the projection of a simplex geometrical structure constructed from the Jensen-Shannon distances among the sources PDFs. The metrics have been evaluated and demonstrated their correct behaviour on a simulated benchmark and with real multi-source biomedical data using the UCI Heart Disease data set. The biomedical data quality assessment based on the proposed stability metrics may improve the efficiency and effectiveness of biomedical data exploitation and research.

  10. Temporal-spatial distribution of non-point source pollution in a drinking water source reservoir watershed based on SWAT

    Directory of Open Access Journals (Sweden)

    M. Wang

    2015-05-01

    Full Text Available The conservation of drinking water source reservoirs has a close relationship between regional economic development and people’s livelihood. Research on the non-point pollution characteristics in its watershed is crucial for reservoir security. Tang Pu Reservoir watershed was selected as the study area. The non-point pollution model of Tang Pu Reservoir was established based on the SWAT (Soil and Water Assessment Tool model. The model was adjusted to analyse the temporal-spatial distribution patterns of total nitrogen (TN and total phosphorus (TP. The results showed that the loss of TN and TP in the reservoir watershed were related to precipitation in flood season. And the annual changes showed an "M" shape. It was found that the contribution of loss of TN and TP accounted for 84.5% and 85.3% in high flow years, and for 70.3% and 69.7% in low flow years, respectively. The contributions in normal flow years were 62.9% and 63.3%, respectively. The TN and TP mainly arise from Wangtan town, Gulai town, and Wangyuan town, etc. In addition, it was found that the source of TN and TP showed consistency in space.

  11. Source apportionment of PM2.5 in urban Shanghai based PMF and PSCF model

    Science.gov (United States)

    Zhao, M.; Xiu, G.; Qiao, T.

    2016-12-01

    Source apportionment of PM2.5 in urban Shanghai based PMF and PSCF modelMengfei Zhao, Guangli Xiu*, Ting Qiao State Environmental Protection Key Laboratory of Environmental Risk Assessment and Control on Chemicals Processes, East China University of Science and Technology, Shanghai, China*Corresponding author: xiugl@ecust.edu.cnAbstract: In the study, we analyzed chemical compositions of PM2.5 collected in urban Shanghai from July 2013 to August 2014. Based on the analyzed species, seven major sources of PM2.5 identified from Positive Matrix Factorization (PMF) model included sulfate and ammonium dominant, nitrate dominant, coal combustion, biomass burning, Cu and Ni smelt industry, marine aerosols and mineral dust. The annual contribution of secondary sources (sulfate, ammonium and nitrate dominant) was similar to primary sources. As for secondary sources, sulfate and ammonium dominant was much higher than nitrate dominant, while nitrate dominant which represented mobile source played more important roles on haze days. Potential Source Contribution Function (PSCF) model was used to investigate the distribution area of each area. The result showed that secondary sources were relatively concentrated, mainly from the surroundings of Shanghai. Most primary sources were affected by regional transports. The source of coal combustion was located in the Northwest, and marine aerosols were from the ocean. The Yangtze River Delta (YRD) region and Pearl River Delta (PRD) region were major source areas of biomass burning and Cu and Ni smelt industry, respectively. In addition, Liquid water content (LWC) in PM2.5 was calculated by a thermodynamic model (AIM-IV). LWC showed positive correlations with nitrate dominant and sulfate and ammonium dominant (r=0.64 and 0.49, p<0.01). The correlation between LWC and nitrate dominant was more significant during heavy haze episodes.

  12. Uncovering New Thermal and Elastic Properties of Nanostructured Materials Using Coherent EUV Light

    Science.gov (United States)

    Hernandez Charpak, Jorge Nicolas

    Advances in nanofabrication have pushed the characteristic dimensions of nanosystems well below 100nm, where physical properties are often significantly different from their bulk counterparts, and accurate models are lacking. Critical technologies such as thermoelectrics for energy harvesting, nanoparticle-mediated thermal therapy, nano-enhanced photovoltaics, and efficient thermal management in integrated circuits depend on our increased understanding of the nanoscale. However, traditional microscopic characterization tools face fundamental limits at the nanoscale. Theoretical efforts to build a fundamental picture of nanoscale thermal dynamics lack experimental validation and still struggle to account for newly reported behaviors. Moreover, precise characterization of the elastic behavior of nanostructured systems is needed for understanding the unique physics that become apparent in small-scale systems, such as thickness-dependent or fabrication-dependent elastic properties. In essence, our ability to fabricate nanosystems has outstripped our ability to understand and characterize them. In my PhD thesis, I present the development and refinement of coherent extreme ultraviolet (EUV) nanometrology, a novel tool used to probe material properties at the intrinsic time- and length-scales of nanoscale dynamics. By extending ultrafast photoacoustic and thermal metrology techniques to very short probing wavelengths using tabletop coherent EUV beams from high-harmonic upconversion (HHG) of femtosecond lasers, coherent EUV nanometrology allows for a new window into nanoscale physics, previously unavailable with traditional techniques. Using this technique, I was able to probe both thermal and acoustic dynamics in nanostructured systems with characteristic dimensions below 50nm with high temporal (sub-ps) and spatial (work is needed for a full theoretical quantitative picture of the experimental results. In other work, I used coherent EUV nanometrology to simultaneously

  13. Physics and technology development of multilayer EUV reflective optics

    NARCIS (Netherlands)

    Louis, Eric

    2012-01-01

    This thesis describes the development of molybdenum/silicon based multilayer reflective elements for the Extreme UV wavelength range, as motivated by their application in photolithography for semiconductor manufacturing. The thesis reflects the basic thin film physics, technological developments,

  14. Meals based on vegetable protein sources (beans and peas) are more satiating than meals based on animal protein sources (veal and pork) ? a randomized cross-over meal test study

    OpenAIRE

    Marlene D. Kristensen; Bendsen, Nathalie T.; Christensen, Sheena M.; Astrup, Arne; Raben, Anne

    2016-01-01

    Background: Recent nutrition recommendations advocate a reduction in protein from animal sources (pork, beef) because of environmental concerns. Instead, protein from vegetable sources (beans, peas) should be increased. However, little is known about the effect of these vegetable protein sources on appetite regulation.Objective: To examine whether meals based on vegetable protein sources (beans/peas) are comparable to meals based on animal protein sources (veal/pork) regarding meal-induced ap...

  15. EUV radiation from pinching discharges of magnetoplasma compressor type and its dependence on the dynamics of compression zone formation

    Science.gov (United States)

    Garkusha, I. E.; Cherednychenko, T. N.; Ladygina, M. S.; Makhlay, V. A.; Petrov, Yu V.; Solyakov, D. G.; Staltsov, V. V.; Yelisyeyev, D. V.; Hassanein, A.

    2014-05-01

    This paper is devoted to the investigation of plasma stream parameters and the intensity of extreme ultraviolet (EUV) radiation from the compression zone in various modes of operation of a magnetoplasma compressor (MPC). Two gases of different masses, either helium or argon, were used for the ignition of MPC discharge under the residual pressure. The plasma stream density along the axis and the EUV radiation energy were measured. It was shown that the compression zone position depends on the initial density of the residual gas. The EUV radiation energy was measured with a calibrated AXUV in the wavelength range of 12.2-15.8 nm. It was revealed that the radiation energy increased by 30-50% with decreasing initial gas pressure.

  16. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    Science.gov (United States)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  17. Evaluating Printability of Buried Native EUV Mask Phase Defects through a Modeling and Simulation Approach

    Energy Technology Data Exchange (ETDEWEB)

    Upadhyaya, Mihir; Jindal, Vibhu; Basavalingappa, Adarsh; Herbol, Henry; Harris-Jones, Jenah; Jang, Il-Yong; Goldberg, Kenneth A.; Mochi, Iacopo; Marokkey, Sajan; Demmerle, Wolfgang; Pistor, Thomas V.; Denbeaux, Gregory

    2015-03-16

    The availability of defect-free masks is considered to be a critical issue for enabling extreme ultraviolet lithography (EUVL) as the next generation technology. Since completely defect-free masks will be hard to achieve, it is essential to have a good understanding of the printability of the native EUV mask defects. In this work, we performed a systematic study of native mask defects to understand the defect printability caused by them. The multilayer growth over native substrate mask blank defects was correlated to the multilayer growth over regular-shaped defects having similar profiles in terms of their width and height. To model the multilayer growth over the defects, a novel level-set multilayer growth model was used that took into account the tool deposition conditions of the Veeco Nexus ion beam deposition tool. The same tool was used for performing the actual deposition of the multilayer stack over the characterized native defects, thus ensuring a fair comparison between the actual multilayer growth over native defects, and modeled multilayer growth over regular-shaped defects. Further, the printability of the characterized native defects was studied with the SEMATECH-Berkeley Actinic Inspection Tool (AIT), an EUV mask-imaging microscope at Lawrence Berkeley National Laboratory (LBNL). Printability of the modeled regular-shaped defects, which were propagated up the multilayer stack using level-set growth model was studied using defect printability simulations implementing the waveguide algorithm. Good comparison was observed between AIT and the simulation results, thus demonstrating that multilayer growth over a defect is primarily a function of a defect’s width and height, irrespective of its shape. This would allow us to predict printability of the arbitrarily-shaped native EUV mask defects in a systematic and robust manner.

  18. Partial differential equation-based localization of a monopole source from a circular array.

    Science.gov (United States)

    Ando, Shigeru; Nara, Takaaki; Levy, Tsukassa

    2013-10-01

    Wave source localization from a sensor array has long been the most active research topics in both theory and application. In this paper, an explicit and time-domain inversion method for the direction and distance of a monopole source from a circular array is proposed. The approach is based on a mathematical technique, the weighted integral method, for signal/source parameter estimation. It begins with an exact form of the source-constraint partial differential equation that describes the unilateral propagation of wide-band waves from a single source, and leads to exact algebraic equations that include circular Fourier coefficients (phase mode measurements) as their coefficients. From them, nearly closed-form, single-shot and multishot algorithms are obtained that is suitable for use with band-pass/differential filter banks. Numerical evaluation and several experimental results obtained using a 16-element circular microphone array are presented to verify the validity of the proposed method.

  19. Research and application of abnormal noise source positioning experiment based on double cylindrical shell

    Directory of Open Access Journals (Sweden)

    LI Ruibiao

    2017-08-01

    Full Text Available Aiming at the problem of frequent abnormal outboard noise in ships, an abnormal noise source location method is proposed, and a location model checked by the double cylindrical shell experiment is built. The model calculates the coordinates through the improved hyperbolic positioning method on the basis of the traditional hyperbolic positioning method, with the time-delay estimation by the generalized cross-correlation method as the input. In the process of the experiment, the outboard abnormal noise source is simulated by the percussion, comparing the positioning accuracy of the two methods and analyzing the influence of time-delay estimation on positioning accuracy. The results show that the hyperbolic positioning method based on double cylindrical shell can accurately locate the coordinates of abnormal noise sources, and is feasible for the abnormal outboard noise source positioning of ships. In addition, the method can provide theoretical guidance for the location of abnormal outboard noise sources.

  20. Development of the negative-tone molecular resists for EB/EUVL having high EUV absorption capacity and molecular design method

    Science.gov (United States)

    Sato, Takashi; Takigawa, Tomoaki; Togashi, Yuta; Toida, Takumi; Echigo, Masatoshi; Harada, Tetsuo; Watanabe, Takeo; Kudo, Hiroto

    2017-10-01

    In this paper, we designed the synthesis of negative-type molecular resist materials for EB and EUVL exposure tools, and their properties were examined. The resist materials for EUVL have been required showing higher sensitivity for high throughput in the lithographic process, and expecting lower shot noise to improve a roughness. In EUVL process, the resist materials must be ionized by absorbing EUV to emit more secondary electrons. The EUV absorption of the synthesized resist materials was measured using their thin films on the silicon wafer, and it was observed that the ratio of EUV absorption of the synthesized resist was higher than in the comparison of that of PHS as a reference., i.e., 2.4 times higher absorption was shown. Furthermore, we examined the relationship between the ratios of EUV absorptions and functional groups of the resist materials. As the result, the sensitivity of resist materials under EUV exposure tool was consistent with their structures.

  1. A high-efficiency electrically-pumped single-photon source based on a photonics nanowire

    DEFF Research Database (Denmark)

    Gregersen, Niels; Nielsen, Torben Roland; Mørk, Jesper

    An electrically-pumped single-photon source design with a predicted efficiency of 89% is proposed. The design is based on a quantum dot embedded in a photonic nanowire with tailored ends and optimized contact electrodes. Unlike cavity-based approaches, the photonic nanowire features broadband...

  2. On the influence of microphone array geometry on HRTF-based Sound Source Localization

    DEFF Research Database (Denmark)

    Farmani, Mojtaba; Pedersen, Michael Syskind; Tan, Zheng-Hua

    2015-01-01

    The direction dependence of Head Related Transfer Functions (HRTFs) forms the basis for HRTF-based Sound Source Localization (SSL) algorithms. In this paper, we show how spectral similarities of the HRTFs of different directions in the horizontal plane influence performance of HRTF-based SSL...

  3. Development of an open-source web-based intervention for Brazilian smokers - Viva sem Tabaco.

    Science.gov (United States)

    Gomide, H P; Bernardino, H S; Richter, K; Martins, L F; Ronzani, T M

    2016-08-02

    Web-based interventions for smoking cessation available in Portuguese do not adhere to evidence-based treatment guidelines. Besides, all existing web-based interventions are built on proprietary platforms that developing countries often cannot afford. We aimed to describe the development of "Viva sem Tabaco", an open-source web-based intervention. The development of the intervention included the selection of content from evidence-based guidelines for smoking cessation, the design of the first layout, conduction of 2 focus groups to identify potential features, refinement of the layout based on focus groups and correction of content based on feedback provided by specialists on smoking cessation. At the end, we released the source-code and intervention on the Internet and translated it into Spanish and English. The intervention developed fills gaps in the information available in Portuguese and the lack of open-source interventions for smoking cessation. The open-source licensing format and its translation system may help researchers from different countries deploying evidence-based interventions for smoking cessation.

  4. Evaluation and selection of open-source EMR software packages based on integrated AHP and TOPSIS.

    Science.gov (United States)

    Zaidan, A A; Zaidan, B B; Al-Haiqi, Ahmed; Kiah, M L M; Hussain, Muzammil; Abdulnabi, Mohamed

    2015-02-01

    Evaluating and selecting software packages that meet the requirements of an organization are difficult aspects of software engineering process. Selecting the wrong open-source EMR software package can be costly and may adversely affect business processes and functioning of the organization. This study aims to evaluate and select open-source EMR software packages based on multi-criteria decision-making. A hands-on study was performed and a set of open-source EMR software packages were implemented locally on separate virtual machines to examine the systems more closely. Several measures as evaluation basis were specified, and the systems were selected based a set of metric outcomes using Integrated Analytic Hierarchy Process (AHP) and TOPSIS. The experimental results showed that GNUmed and OpenEMR software can provide better basis on ranking score records than other open-source EMR software packages. Copyright © 2014 Elsevier Inc. All rights reserved.

  5. Electro-Optic Swept Source Based on AOTF for Wavenumber-Linear Interferometric Sensing and Imaging

    Directory of Open Access Journals (Sweden)

    Ga-Hee Han

    2016-04-01

    Full Text Available We demonstrate a novel electro-optic swept source for wavenumber-linear interferometric sensing and imaging applications. The electro-optic swept source based on an acousto-optic tunable filter (AOTF provides high environmental stability and arbitrary drive function sweeping because the electro-optic wavelength selection does not depend on a mechanical moving component to tune the output lasing wavelength. We show improved stability of the suggested electro-optic swept source, compared to a conventional swept source based on a fiber Fabry–Perot tunable filter (FFP-TF. Various types of wavelength sweeping are demonstrated by applying the programmed drive function to the applied radio frequency (RF of the AOTF. We demonstrated improved image quality of optical coherence tomography (OCT by using the wavenumber-linear drive function of a simple triangular signal, which has a high wavenumber-linearity with an R-square value of 0.99991.

  6. Blind Source Separation Based on Covariance Ratio and Artificial Bee Colony Algorithm

    Directory of Open Access Journals (Sweden)

    Lei Chen

    2014-01-01

    Full Text Available The computation amount in blind source separation based on bioinspired intelligence optimization is high. In order to solve this problem, we propose an effective blind source separation algorithm based on the artificial bee colony algorithm. In the proposed algorithm, the covariance ratio of the signals is utilized as the objective function and the artificial bee colony algorithm is used to solve it. The source signal component which is separated out, is then wiped off from mixtures using the deflation method. All the source signals can be recovered successfully by repeating the separation process. Simulation experiments demonstrate that significant improvement of the computation amount and the quality of signal separation is achieved by the proposed algorithm when compared to previous algorithms.

  7. A two-stage noise source identification technique based on a farfield random parametric array.

    Science.gov (United States)

    Bai, Mingsian R; Chen, You Siang; Lo, Yi-Yang

    2017-05-01

    A farfield random array is implemented for noise source identification. Microphone positions are optimized, with the aid of the simulated annealing method. A two-stage localization and separation algorithm is devised on the basis of the equivalent source method (ESM). In the localization stage, the active source regions are located by using the delay-and-sum method, followed by a parametric localization procedure, stochastic maximum likelihood algorithm. Multidimensional nonlinear optimization is exploited in the bearing estimation process. In the separation stage, source amplitudes are extracted by formulating an inverse problem based on the preceding source bearings identified. The number of equivalent sources is selected to be less than that of microphones to render an overdetermined problem which can be readily solved by using the Tikhonov regularization. Alternatively, the separation problem can be augmented into an underdetermined problem which can be solved by using the compressive sensing technique. Traditionally, farfield arrays only give a relative distribution of source field. However, by using the proposed method, the acoustic variables including sound pressure, particle velocity, sound intensity, and sound power can be calculated based on ESM. Numerical and experimental results of several objective and subjective tests are presented.

  8. Analyzing of economic growth based on electricity consumption from different sources

    Science.gov (United States)

    Maksimović, Goran; Milosavljević, Valentina; Ćirković, Bratislav; Milošević, Božidar; Jović, Srđan; Alizamir, Meysam

    2017-10-01

    Economic growth could be influenced by different factors. In this study was analyzed the economic growth based on the electricity consumption form different sources. As economic growth indicator gross domestic product (GDP) was used. ANFIS (adaptive neuro fuzzy inference system) methodology was applied to determine the most important factors from the given set for the GDP growth prediction. Six inputs were used: electricity production from coal, hydroelectric, natural gas, nuclear, oil and renewable sources. Results shown that the electricity consumption from renewable sources has the highest impact on the economic or GDP growth prediction.

  9. GIS-BASED ROUTE FINDING USING ANT COLONY OPTIMIZATION AND URBAN TRAFFIC DATA FROM DIFFERENT SOURCES

    Directory of Open Access Journals (Sweden)

    M. Davoodi

    2015-12-01

    Full Text Available Nowadays traffic data is obtained from multiple sources including GPS, Video Vehicle Detectors (VVD, Automatic Number Plate Recognition (ANPR, Floating Car Data (FCD, VANETs, etc. All such data can be used for route finding. This paper proposes a model for finding the optimum route based on the integration of traffic data from different sources. Ant Colony Optimization is applied in this paper because the concept of this method (movement of ants in a network is similar to urban road network and movements of cars. The results indicate that this model is capable of incorporating data from different sources, which may even be inconsistent.

  10. Point source preparation by polypyrrole-based conductive thin film production and radionuclide labelling

    Energy Technology Data Exchange (ETDEWEB)

    Los Arcos, J.M.; Rodriguez, L.; Roteta, M. (Inst. Investigacion Basica, CIEMAT, Madrid (Spain))

    1992-02-01

    A new method for radioactive point source preparation by radiolabelling of polypyrrole-based conductive thin films is presented. First, the polypyrrole is prepared onto an ITO glass in an electrolytic cell and then the radioactive material is incorporated locally into a small area as a droplet in which electrochemically activated redox reactions are induced, resulting in a strong, chemical bond of radioactive ions to the functional groups of the pyrrolic conductive surface. This procedure leads to radiolabelling yields greater than 98% and sources with very low self-absorption and 10% or 17% better energy resolution than VYNS or electrodeposited conventional sources. (orig.).

  11. Dynamic pricing based on a cloud computing framework to support the integration of renewable energy sources

    OpenAIRE

    Rajeev Thankappan Nair; Ashok Sankar

    2014-01-01

    Integration of renewable energy sources into the electric grid in the domestic sector results in bidirectional energy flow from the supply side of the consumer to the grid. Traditional pricing methods are difficult to implement in such a situation of bidirectional energy flow and they face operational challenges on the application of price-based demand side management programme because of the intermittent characteristics of renewable energy sources. In this study, a dynamic pricing method usi...

  12. Federating distributed and heterogeneous information sources in neuroimaging: the NeuroBase Project.

    OpenAIRE

    Barillot, Christian; Benali, Habib; Dojat, Michel; Gaignard, Alban; Gibaud, Bernard; Kinkingnéhun, Serge; Matsumoto, Jean-Pierre; Pélégrini-Issac, Mélanie; Simon, Eric; Temal, Lynda

    2006-01-01

    The NeuroBase project aims at studying the requirements for federating, through the Internet, information sources in neuroimaging. These sources are distributed in different experimental sites, hospitals or research centers in cognitive neurosciences, and contain heterogeneous data and image processing programs. More precisely, this project consists in creating of a shared ontology, suitable for supporting various neuroimaging applications, and a computer architecture for accessing and sharin...

  13. Alternative, non-animal based nutrient sources, for organic plant raising OF0308

    OpenAIRE

    Unspecified,

    2003-01-01

    Organic plant raising has been investigated under two previous government funded projects (OF0109 & OF0144) (1, 2) and it was shown in this research that organic ‘transplants’ could be produced for a range of crop species (3, 4, 6, 7). However, some species were easier to produce than others and one of the limiting factors was the availability of suitable nutrient sources, especially for supplementary feeding. The use of animal based nutrient sources in organic plant raising has always bee...

  14. Spectrally tunable light source based on light-emitting diodes for custom lighting solutions

    OpenAIRE

    Burgos Fernández, Francisco Javier; Vilaseca Ricart, Meritxell; Perales Romero, Esther; Herrera Ramírez, Jorge Alexis; Martínez Verdú, Francisco Miguel; Pujol Ramo, Jaume

    2016-01-01

    This study describes a novel spectral LED-based tunable light source used for customized lighting solutions, especially for the reconstruction of CIE (Commission Internationale de l’Éclairage) standard illuminants. The light source comprises 31 spectral bands ranging from 400 to 700 nm, an integrating cube and a control board with a 16-bit resolution. A minimization algorithm to calculate the weighting values for each channel was applied to reproduce illuminants with precision. The difference...

  15. EUV and Coronagraphic Observations of Coronal Mass Ejections ...

    Indian Academy of Sciences (India)

    1998-01-25

    Jan 25, 1998 ... The estimated onset time of the CME was 14:58 UT based on the backward extrap- olation of the height-time diagram. The onset time of the CME is in good agreement with the onset time of the prominence eruption observed by EIT at 195 Å. The determi- nations of onset times from the simple extrapolations ...

  16. Improving Flare Irradiance Models with the Low Pass Filter Relation Between EUV Flare Emissions with Differing Formation Temperatures

    Science.gov (United States)

    Thiemann, Edward M. B.; Eparvier, Francis G.

    2016-10-01

    Solar flares are the result of magnetic reconnection in the solar corona which converts magnetic energy into kinetic energy resulting in the rapid heating of solar plasma. As this plasma cools, extreme ultraviolet (EUV) line emission intensities evolve as the plasma temperature passes through line formation temperatures, resulting in emission lines with cooler formation temperatures peaking after those with hotter formation temperatures. At the 2016 American Astronomical Society Solar Physics Division Meeting in Boulder (SPD2016), we showed that Fe XVIII solar flare light curves are highly correlated with Fe XXIII light curves that have been subjected to the single-pole Low Pass Filter Equation (LPFE) with a time constant equal to the time difference between the peak emissions. The single-pole (or equivalently, RC) LPFE appears frequently in analyses of systems which both store and dissipate heat, and the flare LPFE effect is believed to be related to the underlying cooling processes. Because the LPFE is constrained by a single parameter, this effect has implications for both operational EUV flare irradiance models and understanding thermal processes that occur in post-flare loops. At the time of SPD2016, it was ambiguous as to whether the LPFE effect relates hot thermal bremsstrahlung soft x-ray (SXR) or EUV line emissions with cooler EUV line emissions since Fe XXIII flare light curves are highly correlated with SXR flare light curves. In this study, we present new results characterizing the LPFE relation between multiple emission lines with differing formation temperatures ranging from 107.2 to 105.7 K observed by SDO/EVE and SXR thermal bremsstrahlung emissions observed by GOES/XRS. We show that the LPFE equation relates Fe XVIII with cooler EUV line emissions, providing unambiguous evidence that the LPFE effect exists between EUV line emissions rather than thermal bremsstrahlung and line emissions exclusively. The exact nature of this effect remains an open

  17. Agent-based power sharing scheme for active hybrid power sources

    Science.gov (United States)

    Jiang, Zhenhua

    The active hybridization technique provides an effective approach to combining the best properties of a heterogeneous set of power sources to achieve higher energy density, power density and fuel efficiency. Active hybrid power sources can be used to power hybrid electric vehicles with selected combinations of internal combustion engines, fuel cells, batteries, and/or supercapacitors. They can be deployed in all-electric ships to build a distributed electric power system. They can also be used in a bulk power system to construct an autonomous distributed energy system. An important aspect in designing an active hybrid power source is to find a suitable control strategy that can manage the active power sharing and take advantage of the inherent scalability and robustness benefits of the hybrid system. This paper presents an agent-based power sharing scheme for active hybrid power sources. To demonstrate the effectiveness of the proposed agent-based power sharing scheme, simulation studies are performed for a hybrid power source that can be used in a solar car as the main propulsion power module. Simulation results clearly indicate that the agent-based control framework is effective to coordinate the various energy sources and manage the power/voltage profiles.

  18. Transparent mediation-based access to multiple yeast data sources using an ontology driven interface.

    Science.gov (United States)

    Briache, Abdelaali; Marrakchi, Kamar; Kerzazi, Amine; Navas-Delgado, Ismael; Rossi Hassani, Badr D; Lairini, Khalid; Aldana-Montes, José F

    2012-01-25

    Saccharomyces cerevisiae is recognized as a model system representing a simple eukaryote whose genome can be easily manipulated. Information solicited by scientists on its biological entities (Proteins, Genes, RNAs...) is scattered within several data sources like SGD, Yeastract, CYGD-MIPS, BioGrid, PhosphoGrid, etc. Because of the heterogeneity of these sources, querying them separately and then manually combining the returned results is a complex and time-consuming task for biologists most of whom are not bioinformatics expert. It also reduces and limits the use that can be made on the available data. To provide transparent and simultaneous access to yeast sources, we have developed YeastMed: an XML and mediator-based system. In this paper, we present our approach in developing this system which takes advantage of SB-KOM to perform the query transformation needed and a set of Data Services to reach the integrated data sources. The system is composed of a set of modules that depend heavily on XML and Semantic Web technologies. User queries are expressed in terms of a domain ontology through a simple form-based web interface. YeastMed is the first mediation-based system specific for integrating yeast data sources. It was conceived mainly to help biologists to find simultaneously relevant data from multiple data sources. It has a biologist-friendly interface easy to use. The system is available at http://www.khaos.uma.es/yeastmed/.

  19. Reciprocity in computer-human interaction: source-based, norm-based, and affect-based explanations.

    Science.gov (United States)

    Lee, Seungcheol Austin; Liang, Yuhua Jake

    2015-04-01

    Individuals often apply social rules when they interact with computers, and this is known as the Computers Are Social Actors (CASA) effect. Following previous work, one approach to understand the mechanism responsible for CASA is to utilize computer agents and have the agents attempt to gain human compliance (e.g., completing a pattern recognition task). The current study focuses on three key factors frequently cited to influence traditional notions of compliance: evaluations toward the source (competence and warmth), normative influence (reciprocity), and affective influence (mood). Structural equation modeling assessed the effects of these factors on human compliance with computer request. The final model shows that norm-based influence (reciprocity) increased the likelihood of compliance, while evaluations toward the computer agent did not significantly influence compliance.

  20. Beach debris on Aruba, Southern Caribbean: Attribution to local land-based and distal marine-based sources.

    Science.gov (United States)

    de Scisciolo, Tobia; Mijts, Eric N; Becker, Tatiana; Eppinga, Maarten B

    2016-05-15

    Accumulation of marine (plastic) debris from local land-based and distal marine-based sources along coastlines is a pressing modern issue. Hitherto, assessing the relative contribution of pollution sources through beach surveys is methodologically challenging. We surveyed ten beaches along the leeward and windward coastlines of Aruba (southern Caribbean) to determine differences in macro- and meso-debris densities. Differences were quantified using three metrics: 1) the gradient in macro-debris density away from the waterfront; 2) the proportion of plastic within macro-debris; 3) the meso-:macro-debris ratio. Overall 42,585 macro-debris items and 884 meso-debris items were collected. The density of near-shore macro-debris, proportion of plastic debris herein, and meso-:macro-debris ratio were highest on the windward coastline. These results suggest that southern Caribbean windward coastlines are mainly exposed to debris originating from distal marine-based sources, and leeward coastlines to local land-based sources. Our metrics clearly reflect these differences, providing novel means to survey debris source origin. Copyright © 2016 Elsevier Ltd. All rights reserved.

  1. Short-Sampled Blind Source Separation of Rotating Machinery Signals Based on Spectrum Correction

    Directory of Open Access Journals (Sweden)

    Xiangdong Huang

    2016-01-01

    Full Text Available Nowadays, the existing blind source separation (BSS algorithms in rotating machinery fault diagnosis can hardly meet the demand of fast response, high stability, and low complexity simultaneously. Therefore, this paper proposes a spectrum correction based BSS algorithm. Through the incorporation of FFT, spectrum correction, a screen procedure (consisting of frequency merging, candidate pattern selection, and single-source-component recognition, modified k-means based source number estimation, and mixing matrix estimation, the proposed BSS algorithm can accurately achieve harmonics sensing on field rotating machinery faults in case of short-sampled observations. Both numerical simulation and practical experiment verify the proposed BSS algorithm’s superiority in the recovery quality, stability to insufficient samples, and efficiency over the existing ICA-based methods. Besides rotating machinery fault diagnosis, the proposed BSS algorithm also possesses a vast potential in other harmonics-related application fields.

  2. An Exact Model-Based Method for Near-Field Sources Localization with Bistatic MIMO System.

    Science.gov (United States)

    Singh, Parth Raj; Wang, Yide; Chargé, Pascal

    2017-03-30

    In this paper, we propose an exact model-based method for near-field sources localization with a bistatic multiple input, multiple output (MIMO) radar system, and compare it with an approximated model-based method. The aim of this paper is to propose an efficient way to use the exact model of the received signals of near-field sources in order to eliminate the systematic error introduced by the use of approximated model in most existing near-field sources localization techniques. The proposed method uses parallel factor (PARAFAC) decomposition to deal with the exact model. Thanks to the exact model, the proposed method has better precision and resolution than the compared approximated model-based method. The simulation results show the performance of the proposed method.

  3. 5000 groove/mm multilayer-coated blazed grating with 33percent efficiency in the 3rd order in the EUV wavelength range

    Energy Technology Data Exchange (ETDEWEB)

    Advanced Light Source; Voronov, Dmitriy L.; Anderson, Erik; Cambie, Rossana; Salmassi, Farhad; Gullikson, Eric; Yashchuk, Valeriy; Padmore, Howard; Ahn, Minseung; Chang, Chih-Hao; Heilmann, Ralf; Schattenburg, Mark

    2009-07-07

    We report on recent progress in developing diffraction gratings which can potentially provide extremely high spectral resolution of 105-106 in the EUV and soft x-ray photon energy ranges. Such a grating was fabricated by deposition of a multilayer on a substrate which consists ofa 6-degree blazed grating with a high groove density. The fabrication of the substrate gratings was based on scanning interference lithography and anisotropic wet etch of silicon single crystals. The optimized fabrication process provided precise control of the grating periodicity, and the grating groove profile, together with very short anti-blazed facets, and near atomically smooth surface blazed facets. The blazed grating coated with 20 Mo/Si bilayers demonstrated a diffraction efficiency in the third order as high as 33percent at an incidence angle of 11? and wavelength of 14.18 nm.

  4. Spectral matching research for light-emitting diode-based neonatal jaundice therapeutic device light source

    Science.gov (United States)

    Gan, Ruting; Guo, Zhenning; Lin, Jieben

    2015-09-01

    To decrease the risk of bilirubin encephalopathy and minimize the need for exchange transfusions, we report a novel design for light source of light-emitting diode (LED)-based neonatal jaundice therapeutic device (NJTD). The bilirubin absorption spectrum in vivo was regarded as target. Based on spectral constructing theory, we used commercially available LEDs with different peak wavelengths and full width at half maximum as matching light sources. Simple genetic algorithm was first proposed as the spectral matching method. The required LEDs number at each peak wavelength was calculated, and then, the commercial light source sample model of the device was fabricated to confirm the spectral matching technology. In addition, the corresponding spectrum was measured and the effect was analyzed finally. The results showed that fitted spectrum was very similar to the target spectrum with 98.86 % matching degree, and the actual device model has a spectrum close to the target with 96.02 % matching degree. With higher fitting degree and efficiency, this matching algorithm is very suitable for light source matching technology of LED-based spectral distribution, and bilirubin absorption spectrum in vivo will be auspicious candidate for the target spectrum of new LED-based NJTD light source.

  5. Dynamics of the spatial electron density distribution of EUV-induced plasmas

    Science.gov (United States)

    van der Horst, R. M.; Beckers, J.; Osorio, E. A.; Banine, V. Y.

    2015-11-01

    We studied the temporal evolution of the electron density distribution in a low pressure pulsed plasma induced by high energy extreme ultraviolet (EUV) photons using microwave cavity resonance spectroscopy (MCRS). In principle, MCRS only provides space averaged information about the electron density. However, we demonstrate here the possibility to obtain spatial information by combining multiple resonant modes. It is shown that EUV-induced plasmas, albeit being a rather exotic plasma, can be explained by known plasma physical laws and processes. Two stages of plasma behaviour are observed: first the electron density distribution contracts, after which it expands. It is shown that the contraction is due to cooling of the electrons. The moment when the density distribution starts to expand is related to the inertia of the ions. After tens of microseconds, the electrons reached the wall of the cavity. The speed of this expansion is dependent on the gas pressure and can be divided into two regimes. It is shown that the acoustic dominated regime the expansion speed is independent of the gas pressure and that in the diffusion dominated regime the expansion depends reciprocal on the gas pressure.

  6. Patterning with metal-oxide EUV photoresist: patterning capability, resist smoothing, trimming, and selective stripping

    Science.gov (United States)

    Mao, Ming; Lazzarino, Frederic; De Schepper, Peter; De Simone, Danilo; Piumi, Daniele; Luong, Vinh; Yamashita, Fumiko; Kocsis, Michael; Kumar, Kaushik

    2017-03-01

    Inpria metal-oxide photoresist (PR) serves as a thin spin-on patternable hard mask for EUV lithography. Compared to traditional organic photoresists, the ultrathin metal-oxide photoresist ( 12nm after development) effectively mitigates pattern collapse. Because of the high etch resistance of the metal-oxide resist, this may open up significant scope for more aggressive etches, new chemistries, and novel integration schemes. We have previously shown that metal-oxide PR can be successfully used to pattern the block layer for the imec 7-nm technology node[1] and advantageously replace a multiple patterning approach, which significantly reduces the process complexity and effectively decreases the cost. We also demonstrated the formation of 16nm half pitch 1:1 line/space with EUV single print[2], which corresponds to a metal 2 layer for the imec 7-nm technology node. In this paper, we investigate the feasibility of using Inpria's metal-oxide PR for 16nm line/space patterning. In meanwhile, we also explore the different etch process for LWR smoothing, resist trimming and resist stripping.

  7. EUV-induced oxidation of carbon on TiO2

    Science.gov (United States)

    Faradzhev, Nadir S.; Hill, Shannon B.

    2016-10-01

    Previously we reported estimates of the maximum etch rates of C on TiO2 by oxidizers including NO, O3 and H2O2 when irradiated by a spatially-non-uniform beam of extreme ultraviolet (EUV) radiation at 13.5 nm (Faradzhev et al., 2013 [6]). Here we extend that work by presenting temporally and spatially resolved measurements of the C etching by these oxidizers as a function of EUV intensity in the range (0.3 to 3) mW/mm2 [(0.2 to 2) × 10 [16] photons s- 1 cm- 2]. We find that the rates for NO scale linearly with intensity and are smaller than those for O3, which exhibit a weak, sub-linear intensity dependence in this range. We demonstrate that these behaviors are consistent with adsorption of the oxidizing precursor on the C surface followed by a photon-stimulated reaction resulting in volatile C-containing products. The kinetics of photon-induced C etching by hydrogen peroxide, however, appear to be more complex. The spatially resolved measurements reveal that C removal by H2O2 begins at the edges of the C spot, where the light intensity is the lowest, and proceeds toward the center of the spot. This localization of the reaction may occur because hydroxyl radicals are produced efficiently on the catalytically active TiO2 surface.

  8. EUV FLICKERING OF SOLAR CORONAL LOOPS: A NEW DIAGNOSTIC OF CORONAL HEATING

    Energy Technology Data Exchange (ETDEWEB)

    Tajfirouze, E.; Reale, F.; Peres, G. [Dipartimento di Fisica e Chimica, Università di Palermo, Piazza del Parlamento 1, I-90134 (Italy); Testa, P., E-mail: reale@astropa.unipa.it [Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA 02138 (United States)

    2016-02-01

    A previous work of ours found the best agreement between EUV light curves observed in an active region core (with evidence of super-hot plasma) and those predicted from a model with a random combination of many pulse-heated strands with a power-law energy distribution. We extend that work by including spatially resolved strand modeling and by studying the evolution of emission along the loops in the EUV 94 Å and 335 Å channels of the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory. Using the best parameters of the previous work as the input of the present one, we find that the amplitude of the random fluctuations driven by the random heat pulses increases from the bottom to the top of the loop in the 94 Å channel and from the top to the bottom in the 335 Å channel. This prediction is confirmed by the observation of a set of aligned neighboring pixels along a bright arc of an active region core. Maps of pixel fluctuations may therefore provide easy diagnostics of nanoflaring regions.

  9. Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography

    Science.gov (United States)

    Singh, Vikram; Satyanarayana, Vardhineedi Sri Venkata; Batina, Nikola; Reyes, Israel Morales; Sharma, Satinder K.; Kessler, Felipe; Scheffer, Francine R.; Weibel, Daniel E.; Ghosh, Subrata; Gonsalves, Kenneth E.

    2014-10-01

    Although extreme ultraviolet (EUV) lithography is being considered as one of the most promising next-generation lithography techniques for patterning sub-20 nm features, the development of suitable EUV resists remains one of the main challenges confronting the semiconductor industry. The goal is to achieve sub-20 nm line patterns having low line edge roughness (LER) of <1.8 nm and a sensitivity of 5 to 20 mJ/cm2. The present work demonstrates the lithographic performance of two nonchemically amplified (n-CARs) negative photoresists, MAPDST homopolymer and MAPDST-MMA copolymer, prepared from suitable monomers containing the radiation sensitive sulfonium functionality. Investigations into the effect of several process parameters are reported. These include spinning conditions to obtain film thicknesses <50 nm, baking regimes, exposure conditions, and the resulting surface topographies. The effect of these protocols on sensitivity, contrast, and resolution has been assessed for the optimization of 20 nm features and the corresponding LER/line width roughness. These n-CARs have also been found to possess high etch resistance. The etch durability of MAPDST homopolymer and MAPDST-MMA copolymer (under SF6 plasma chemistry) with respect to the silicon substrate are 7.2∶1 and 8.3∶1, respectively. This methodical investigation will provide guidance in designing new resist materials with improved efficiency for EUVL through polymer microstructure engineering.

  10. eBeam initiative survey reports confidence in EUV and multi-beam technology

    Science.gov (United States)

    Fujimura, Aki; Willis, Jan

    2017-07-01

    A record 73 industry luminaries representing more than 30 different companies from across the semiconductor ecosystem participated in the 2016 eBeam Initiative perceptions survey. The eBeam Initiative also completed its second annual mask makers' survey with feedback from 10 captive and merchant photomask manufacturers. Among the results of the members' perception survey, respondents remained optimistic in the implementation of EUV lithography for semiconductor high-volume manufacturing (HVM), with confidence in EUV increasing over other next-generation lithography (NGL) techniques compared with last year's survey. In addition, expectations on the use of multi-beam technology for advanced photomask HVM by the end of 2018 continue to remain strong. Results from the eBeam Initiative's second annual mask makers' survey indicate several surprising trends on mask making related to write times, turn-around time (TAT) for mask manufacturing, resists, mask yields and other critical issues. The author will review the key findings and offer his viewpoint on their significance.

  11. High-resolution and large-area nanoparticle arrays using EUV interference lithography.

    Science.gov (United States)

    Karim, Waiz; Tschupp, Simon Andreas; Oezaslan, Mehtap; Schmidt, Thomas J; Gobrecht, Jens; van Bokhoven, Jeroen A; Ekinci, Yasin

    2015-04-28

    Well-defined model systems are needed for better understanding of the relationship between optical, electronic, magnetic, and catalytic properties of nanoparticles and their structure. Chemical synthesis of metal nanoparticles results in large size and shape dispersion and lack of lateral order. In contrast, conventional top-down lithography techniques provide control over the lateral order and dimensions. However, they are either limited in resolution or have low throughput and therefore do not enable the large patterning area needed to obtain good signal-to-noise ratio in common analytical and characterization techniques. Extreme ultraviolet (EUV) lithography has the throughput and simplicity advantages of photolithography as well as high resolution due to its wavelength. Using EUV achromatic Talbot lithography, we have obtained 15 nm particle arrays with a periodicity of about 100 nm over an area of several square centimeters with high-throughput enabling the use of nanotechnology for fabrication of model systems to study large ensembles of well-defined identical nanoparticles with a density of 10(10) particles cm(-2).

  12. A GIS-based atmospheric dispersion model for pollutants emitted by complex source areas.

    Science.gov (United States)

    Teggi, Sergio; Costanzini, Sofia; Ghermandi, Grazia; Malagoli, Carlotta; Vinceti, Marco

    2018-01-01

    Gaussian dispersion models are widely used to simulate the concentrations and deposition fluxes of pollutants emitted by source areas. Very often, the calculation time limits the number of sources and receptors and the geometry of the sources must be simple and without holes. This paper presents CAREA, a new GIS-based Gaussian model for complex source areas. CAREA was coded in the Python language, and is largely based on a simplified formulation of the very popular and recognized AERMOD model. The model allows users to define in a GIS environment thousands of gridded or scattered receptors and thousands of complex sources with hundreds of vertices and holes. CAREA computes ground level, or near ground level, concentrations and dry deposition fluxes of pollutants. The input/output and the runs of the model can be completely managed in GIS environment (e.g. inside a GIS project). The paper presents the CAREA formulation and its applications to very complex test cases. The tests shows that the processing time are satisfactory and that the definition of sources and receptors and the output retrieval are quite easy in a GIS environment. CAREA and AERMOD are compared using simple and reproducible test cases. The comparison shows that CAREA satisfactorily reproduces AERMOD simulations and is considerably faster than AERMOD. Copyright © 2017 Elsevier B.V. All rights reserved.

  13. Standard Practice for Conducting Irradiations at Accelerator-Based Neutron Sources

    CERN Document Server

    American Society for Testing and Materials. Philadelphia

    1996-01-01

    1.1 This practice covers procedures for irradiations at accelerator-based neutron sources. The discussion focuses on two types of sources, namely nearly monoenergetic 14-MeV neutrons from the deuterium-tritium T(d,n) interaction, and broad spectrum neutrons from stopping deuterium beams in thick beryllium or lithium targets. However, most of the recommendations also apply to other types of accelerator-based sources, including spallation neutron sources (1). Interest in spallation sources has increased recently due to their proposed use for transmutation of fission reactor waste (2). 1.2 Many of the experiments conducted using such neutron sources are intended to simulate irradiation in another neutron spectrum, for example, that from a DT fusion reaction. The word simulation is used here in a broad sense to imply an approximation of the relevant neutron irradiation environment. The degree of conformity can range from poor to nearly exact. In general, the intent of these simulations is to establish the fundam...

  14. A Novel Method Based on Oblique Projection Technology for Mixed Sources Estimation

    Directory of Open Access Journals (Sweden)

    Weijian Si

    2014-01-01

    Full Text Available Reducing the computational complexity of the near-field sources and far-field sources localization algorithms has been considered as a serious problem in the field of array signal processing. A novel algorithm caring for mixed sources location estimation based on oblique projection is proposed in this paper. The sources are estimated at two different stages and the sensor noise power is estimated and eliminated from the covariance which improve the accuracy of the estimation of mixed sources. Using the idea of compress, the range information of near-field sources is obtained by searching the partial area instead of the whole Fresnel area which can reduce the processing time. Compared with the traditional algorithms, the proposed algorithm has the lower computation complexity and has the ability to solve the two closed-spaced sources with high resolution and accuracy. The duplication of range estimation is also avoided. Finally, simulation results are provided to demonstrate the performance of the proposed method.

  15. GIS-Based Noise Simulation Open Source Software: N-GNOIS

    Science.gov (United States)

    Vijay, Ritesh; Sharma, A.; Kumar, M.; Shende, V.; Chakrabarti, T.; Gupta, Rajesh

    2015-12-01

    Geographical information system (GIS)-based noise simulation software (N-GNOIS) has been developed to simulate the noise scenario due to point and mobile sources considering the impact of geographical features and meteorological parameters. These have been addressed in the software through attenuation modules of atmosphere, vegetation and barrier. N-GNOIS is a user friendly, platform-independent and open geospatial consortia (OGC) compliant software. It has been developed using open source technology (QGIS) and open source language (Python). N-GNOIS has unique features like cumulative impact of point and mobile sources, building structure and honking due to traffic. Honking is the most common phenomenon in developing countries and is frequently observed on any type of roads. N-GNOIS also helps in designing physical barrier and vegetation cover to check the propagation of noise and acts as a decision making tool for planning and management of noise component in environmental impact assessment (EIA) studies.

  16. Direct fiber-coupled single photon source based on a photonic crystal waveguide

    Energy Technology Data Exchange (ETDEWEB)

    Ahn, Byeong-Hyeon, E-mail: seygene@kaist.ac.kr; Lee, Chang-Min; Lim, Hee-Jin [Department of Physics, KAIST, Daejeon 305-701 (Korea, Republic of); Schlereth, Thomas W.; Kamp, Martin [Technische Physik, Physikalisches Institut and Wilhelm Conrad Röntgen-Center for Complex Material Systems, Universität Würzburg, Am Hubland, D-97074 Würzburg (Germany); Höfling, Sven [Technische Physik, Physikalisches Institut and Wilhelm Conrad Röntgen-Center for Complex Material Systems, Universität Würzburg, Am Hubland, D-97074 Würzburg (Germany); SUPA, School of Physics and Astronomy, University of St. Andrews, St. Andrews KY16 9SS (United Kingdom); Lee, Yong-Hee [Department of Physics, KAIST, Daejeon 305-701 (Korea, Republic of); Graduate School of Nanoscience and Technology (WCU), KAIST, Daejeon 305-701 (Korea, Republic of)

    2015-08-24

    A single photon source plays a key role in quantum applications such as quantum computers and quantum communications. Epitaxially grown quantum dots are one of the promising platforms to implement a good single photon source. However, it is challenging to realize an efficient single photon source based on semiconductor materials due to their high refractive index. Here we demonstrate a direct fiber coupled single photon source with high collection efficiency by employing a photonic crystal (PhC) waveguide and a tapered micro-fiber. To confirm the single photon nature, the second-order correlation function g{sup (2)}(τ) is measured with a Hanbury Brown-Twiss setup. The measured g{sup (2)}(0) value is 0.15, and we can estimate 24% direct collection efficiency from a quantum dot to the fiber.

  17. Physics-Based Hazard Assessment for Critical Structures Near Large Earthquake Sources

    Science.gov (United States)

    Hutchings, L.; Mert, A.; Fahjan, Y.; Novikova, T.; Golara, A.; Miah, M.; Fergany, E.; Foxall, W.

    2017-09-01

    We argue that for critical structures near large earthquake sources: (1) the ergodic assumption, recent history, and simplified descriptions of the hazard are not appropriate to rely on for earthquake ground motion prediction and can lead to a mis-estimation of the hazard and risk to structures; (2) a physics-based approach can address these issues; (3) a physics-based source model must be provided to generate realistic phasing effects from finite rupture and model near-source ground motion correctly; (4) wave propagations and site response should be site specific; (5) a much wider search of possible sources of ground motion can be achieved computationally with a physics-based approach; (6) unless one utilizes a physics-based approach, the hazard and risk to structures has unknown uncertainties; (7) uncertainties can be reduced with a physics-based approach, but not with an ergodic approach; (8) computational power and computer codes have advanced to the point that risk to structures can be calculated directly from source and site-specific ground motions. Spanning the variability of potential ground motion in a predictive situation is especially difficult for near-source areas, but that is the distance at which the hazard is the greatest. The basis of a "physical-based" approach is ground-motion syntheses derived from physics and an understanding of the earthquake process. This is an overview paper and results from previous studies are used to make the case for these conclusions. Our premise is that 50 years of strong motion records is insufficient to capture all possible ranges of site and propagation path conditions, rupture processes, and spatial geometric relationships between source and site. Predicting future earthquake scenarios is necessary; models that have little or no physical basis but have been tested and adjusted to fit available observations can only "predict" what happened in the past, which should be considered description as opposed to prediction

  18. Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source

    Science.gov (United States)

    Tao, Y.; Tillack, M. S.; Harilal, S. S.; Sequoia, K. L.; Burdt, R. A.; Najmabadi, F.

    2007-05-01

    A thin Sn film was investigated as a mass-limited target for an extreme ultraviolet (EUV) lithography source. It was found that those energetic ions that are intrinsic with the mass-limited Sn target could be efficiently mitigated by introducing a low-energy prepulse. High in-band conversion efficiency from a laser to 13.5 nm EUV light could be obtained using an Sn film with a thickness down to 30 nm when irradiated by dual laser pulses. It was shown that the combination of dual pulse and inert Ar gas could fully mitigate ions with a low ambient pressure nearly without the penalty of the absorption of the EUV light.

  19. Risk-based prioritization methodology for the classification of groundwater pollution sources.

    Science.gov (United States)

    Pizzol, Lisa; Zabeo, Alex; Critto, Andrea; Giubilato, Elisa; Marcomini, Antonio

    2015-02-15

    Water management is one of the EU environmental priorities and it is one of the most serious challenges that today's major cities are facing. The main European regulation for the protection of water resources is represented by the Water Framework Directive (WFD) and the Groundwater Directive (2006/118/EC) which require the identification, risk-based ranking and management of sources of pollution and the identification of those contamination sources that threaten the achievement of groundwater's good quality status. The aim of this paper is to present a new risk-based prioritization methodology to support the determination of a management strategy for the achievement of the good quality status of groundwater. The proposed methodology encompasses the following steps: 1) hazard analysis, 2) pathway analysis, 3) receptor vulnerability analysis and 4) relative risk estimation. Moreover, by integrating GIS functionalities and Multi Criteria Decision Analysis (MCDA) techniques, it allows to: i) deal with several sources and multiple impacted receptors within the area of concern; ii) identify different receptors' vulnerability levels according to specific groundwater uses; iii) assess the risks posed by all contamination sources in the area; and iv) provide a risk-based ranking of the contamination sources that can threaten the achievement of the groundwater good quality status. The application of the proposed framework to a well-known industrialized area located in the surroundings of Milan (Italy) is illustrated in order to demonstrate the effectiveness of the proposed framework in supporting the identification of intervention priorities. Among the 32 sources analyzed in the case study, three sources received the highest relevance score, due to the medium-high relative risks estimated for Chromium (VI) and Perchloroethylene. The case study application showed that the developed methodology is flexible and easy to adapt to different contexts, thanks to the possibility to

  20. Selecting Color-based Tracers and Classifying Sediment Sources in the Assessment of Sediment Dynamics Using Sediment Source Fingerprinting.

    Science.gov (United States)

    Barthod, Louise R M; Liu, Kui; Lobb, David A; Owens, Philip N; Martínez-Carreras, Núria; Koiter, Alexander J; Petticrew, Ellen L; McCullough, Gregory K; Liu, Cenwei; Gaspar, Leticia

    2015-09-01

    The use of sediment color as a fingerprint property to determine sediment sources is an emerging technique that can provide a rapid and inexpensive means of investigating sediment sources. The present study aims to test the feasibility of color fingerprint properties to apportion sediment sources within the South Tobacco Creek Watershed (74 km) in Manitoba, Canada. Suspended sediment from 2009 to 2011 at six monitoring stations and potential source samples along the main stem of the creek were collected. Reflectance spectra of sediments and source materials were quantified using a diffuse reflectance spectrometry, and 16 color coefficients were derived from several color space models. Canonical discriminant analysis was used to reclassify and downsize sediment source groups. After the linear additive test and stepwise discriminant function analysis, four color coefficients were chosen to fit the Stable Isotope Analysis in R model. Consistent with the conventional fingerprinting approach, the color fingerprint results demonstrated a switch in the dominant sediment source between the headwaters and the outlet of the watershed, with the main sources being topsoil in the upper reaches, whereas outcrop shale and stream bank materials dominated in the lower reaches. The color fingerprinting approach can be integrated with conventional fingerprints (e.g., geochemical and fallout radionuclide properties) to improve source discrimination, which is a key component for source ascription modeling. We concluded that the use of color fingerprints is a promising, cost-effective technique for sediment source fingerprinting. Copyright © by the American Society of Agronomy, Crop Science Society of America, and Soil Science Society of America, Inc.

  1. Shunt PWM advanced var compensators based on voltage source inverters for Facts applications

    Energy Technology Data Exchange (ETDEWEB)

    Barbosa, Pedro G.; Misaka, Isamu; Watanabe, Edson H. [Universidade Federal, Rio de Janeiro, RJ (Brazil). Coordenacao dos Programas de Pos-graduacao de Engenharia

    1994-12-31

    Increased attention has been given to improving power system operation. This paper presents modeling, analysis and design of reactive shunt power compensators based on PWM-Voltage Source Inverters (Pulse Width Modulation -Voltage Source Inverters). (Pulse Width Modulation - Voltage Source Inverters). The control algorithm is based on new concepts of instantaneous active and reactive power theory. The objective is to show that with a small capacitor in the side of a 3-phase PWM-VSI it is possible to synthesize a variable reactive (capacitive or inductive) device. Design procedures and experimental results are presented. The feasibility of this method was verified by digital simulations and measurements on a small scale model. (author) 9 refs., 12 figs.

  2. Physics Model Based Scatter Correction in Multi-source Interior Computed Tomography.

    Science.gov (United States)

    Gong, Hao; Li, Bin; Jia, Xun; Gao, Guohua

    2017-08-17

    Multi-source interior computed tomography (CT) has a great potential to provide ultra-fast and organ-oriented imaging at low radiation dose. However, X-ray cross scattering from multiple simultaneously activated X-ray imaging chains compromises imaging quality. Previously, we published two hardware based scatter correction methods for multi-source interior CT. Here, we propose a software based scatter correction method, with the benefit of no need for hardware modifications. The new method is based on a physics model and an iterative framework. The physics model was derived analytically, and was used to calculate X-ray scattering signals in both forward direction and cross directions in multi-source interior CT. The physics model was integrated to an iterative scatter correction framework to reduce scatter artifacts. The method was applied to phantom data from both Monte Carlo simulations and physical experimentation that were designed to emulate the image acquisition in a multi-source interior CT architecture recently proposed by our team. The proposed scatter correction method reduced scatter artifacts significantly, even with only one iteration. Within a few iterations, the reconstructed images fast converged toward the "scatter-free" reference images. After applying the scatter correction method, the maximum CT number error at the region-of-interests (ROIs) was reduced to 46 HU in numerical phantom dataset and 48 HU in physical phantom dataset respectively, and the contrast-noise-ratio (CNR) at those ROIs increased by up to 44.3% and up to 19.7% respectively. The proposed physics model based iterative scatter correction method could be useful for scatter correction in dual-source or multi-source CT.

  3. Extraction of Active Regions and Coronal Holes from EUV Images Using the Unsupervised Segmentation Method in the Bayesian Framework

    Science.gov (United States)

    Arish, S.; Javaherian, M.; Safari, H.; Amiri, A.

    2016-04-01

    The solar corona is the origin of very dynamic events that are mostly produced in active regions (AR) and coronal holes (CH). The exact location of these large-scale features can be determined by applying image-processing approaches to extreme-ultraviolet (EUV) data.

  4. Adaptive Optics to Counteract Thermal Aberrations : System Design for EUV-Lithography with Sub-nm Precision

    NARCIS (Netherlands)

    Saathof, R.

    2013-01-01

    In highly precise systems the thermal expansion of system-parts is of increasing concern, since it can severely compromise its performance at sub-nanometre level. An example of such a system is an Extreme UltraViolet (EUV)-lithography machine that is used in the semi-conductor industry to project

  5. Design of a compact device to generate and test beams with orbital angular momentum in the EUV.

    Science.gov (United States)

    Pabon, D O; Ledesma, S A; Quinteiro, G F; Capeluto, M G

    2017-10-10

    We present a compact design to generate and test optical-vortex beams with possible applications in the extreme ultraviolet (EUV) region of the electromagnetic spectrum. The device consists of a diffractive mask where both the beam with orbital angular momentum and the reference wavefront to test its phase are generated. In order to show that the proposal would work in the EUV, simulations and proof-of-principle experiments were performed, using typical parameters for EUV holography scaled to visible wavelengths. As the simplest case, we consider the well-known Laguerre-Gaussian (LG)-like beams, which have a single vortex in the propagation axis. To further test the versatility of the device, we consider Mathieu beams, more complex structured beams that may contain several vortices. In the experiment, a spatial light modulator was used to display the mask. As examples, we show the results for a LG-like beam with topological charge ℓ=1 and Mathieu beams with topological charge ℓ=2 and ellipticity q=2. These results show the potential of the device to generate a variety of beam shapes at EUV wavelengths.

  6. The Environment Friendly Power Source for Power Supply of Mobile Communication Base Stations

    Science.gov (United States)

    Rudenko, N. V.; Ershov, V. V.; Evstafiev, V. V.

    2017-05-01

    The article describes the technical proposals to improve environmental and resource characteristics of the autonomous power supply systems of mobile communication base stations based on renewable energy sources, while ensuring the required reliability and security of power supply. These include: the replacement of diesel-generator with clean energy source - an electrochemical generator based on hydrogen fuel cells; the use of wind turbines with a vertical axis; use of specialized batteries. Based on the analysis of the know technical solutions, the structural circuit diagram of the hybrid solar-wind-hydrogen power plant and the basic principles of the algorithm of its work were proposed. The implementation of these proposals will improve the environmental and resource characteristics.

  7. MSQuant, an Open Source Platform for Mass Spectrometry-Based Quantitative Proteomics

    DEFF Research Database (Denmark)

    Mortensen, Peter; Gouw, Joost W; Olsen, Jesper V

    2010-01-01

    Mass spectrometry-based proteomics critically depends on algorithms for data interpretation. A current bottleneck in the rapid advance of proteomics technology is the closed nature and slow development cycle of vendor-supplied software solutions. We have created an open source software environment...

  8. Integrated CARS source based on seeded four-wave mixing in silicon nitride

    NARCIS (Netherlands)

    Epping, J.P.; Kues, M.; van der Slot, Petrus J.M.; Lee, Christopher James; Fallnich, C.; Boller, Klaus J.

    2013-01-01

    We present a theoretical investigation of an integrated nonlinear light source for coherent anti-Stokes Raman scattering (CARS) based on silicon nitride waveguides. Wavelength tunable and temporally synchronized signal and idler pulses are obtained by using seeded four-wave mixing. We find that the

  9. Estimation of Methane Emissions from Municipal Solid Waste Landfills in China Based on Point Emission Sources

    Directory of Open Access Journals (Sweden)

    Cai Bo-Feng

    2014-01-01

    Citation: Cai, B.-F., Liu, J.-G., Gao, Q.-X., et al., 2014. Estimation of methane emissions from municipal solid waste landfills in China based on point emission sources. Adv. Clim. Change Res. 5(2, doi: 10.3724/SP.J.1248.2014.081.

  10. QUANTUM CRYPTOGRAPHY SYSTEM WITH A SINGLE PHOTON SOURCE BASED ON THE SPONTANEOUS PARAMETRIC SCATTERING EFFECT

    Directory of Open Access Journals (Sweden)

    V. I. Egorov

    2012-01-01

    Full Text Available A scheme of a single photon source for quantum informatics applications based on the spontaneous parametric scattering effect is proposed and a quantum cryptography setup using it is presented. The system is compared to the alternative ones that operate with attenuated classic light.

  11. Presence and sources of anthropogenic perfluorinated alkyl acids in tap-water based beverages

    NARCIS (Netherlands)

    Eschauzier, C.; Hoppe, M.; Schlummer, M.; de Voogt, P.

    2013-01-01

    This study investigates the presence and sources of perfluorinated alkyl acids (PFAAs) in tap water and corresponding tap-water based beverages such as coffee and cola collected in the city of Amsterdam, The Netherlands. Exposure pathways studies have shown that low concentrations of PFAA in tap

  12. Latin Revived: Source-Based Vocabulary Lessons Courtesy of Harry Potter

    Science.gov (United States)

    Nilsen, Alleen Pace; Nilsen, Don L. F.

    2006-01-01

    Teachers can build on students' familiarity with and respect for the Harry Potter books to create source-based vocabulary lessons. The idea is to work with the Latin roots that J. K. Rowling uses to create original names for places, people, and magical charms and then to extend students' knowledge through exploration of additional English words…

  13. Analysis of filtration properties of locally sourced base oil for the ...

    African Journals Online (AJOL)

    ... of locally sourced oil like, groundnut oil, melon oil, vegetable oil, soya oil and palm oil as substitute for diesel oil in formulating oil base drilling fluids relative to filtration properties. The filtrate volumes of each of the oils were obtained for filtration control analysis. With increasing potash and industrial starch quantities during ...

  14. Performance verification of an epithermal neutron flux monitor using accelerator-based BNCT neutron sources

    Science.gov (United States)

    Guan, X.; Murata, I.; Wang, T.

    2017-09-01

    The performance of an epithermal neutron flux monitor developed for boron neutron capture therapy (BNCT) is verified by Monte Carlo simulations using accelerator-based neutron sources (ABNSs). The results indicate that the developed epithermal neutron flux monitor works well and it can be efficiently used in practical applications to measure the epithermal neutron fluxes of ABNSs in a high accuracy.

  15. Blind Source Separation Based on Fast-Convergence Algorithm Using ICA and Beamforming

    OpenAIRE

    Hiroshi Saruwatari; Toshiya Kawamura; Kiyohiro Shikano

    2001-01-01

    We propose a new algorithm for blind source separation (BSS), in which independent component analysis (ICA) and beamforming are combined to resolve the low-convergence problem through optimization in ICA. The proposed method consists of the following three parts: (1) frequency-domain ICA with direction-of-arrival (DOA) estimation, (2) null beamforming based on the estimated DOA, and (3) integration of (1) and (2) based on the algorithm diversity in both iteration and frequency domain. The inv...

  16. Blind Source Separation for Speech Based on Fast-convergence Algorithm with ICA and Beamforming

    OpenAIRE

    Hiroshi Saruwatari; Toshiya Kawamura; Kiyohiro Shikano

    2001-01-01

    We propose a new algorithm for blind source separation (BSS), in which independent component analysis (ICA) and beamforming are combined to resolve the low-convergence problem through optimization in ICA. The proposed method consists of the following three parts: (1) frequency-domain ICA with direction-of-arrival (DOA) estimation, (2) null beamforming based on the estimated DOA, and (3) integration of (1) and (2) based on the algorithm diversity in both iteration and frequency domain. The inv...

  17. Analysis of Ozone (O3 and Erythemal UV (EUV measured by TOMS in the equatorial African belt

    Directory of Open Access Journals (Sweden)

    Øyvind Frette

    2010-03-01

    Full Text Available We presented time series of total ozone column amounts (TOCAs and erythemal UV (EUV doses derived from measurements by TOMS (Total Ozone Mapping Spectrometer instruments on board the Nimbus-7 (N7 and the Earth Probe (EP satellites for three locations within the equatorial African belt for the period 1979 to 2000. The locations were Dar-es-Salaam (6.8° S, 39.26° E in Tanzania, Kampala (0.19° N, 32.34° E in Uganda, and Serrekunda (13.28° N, 16.34° W in Gambia. Equatorial Africa has high levels of UV radiation, and because ozone shields UV radiation from reaching the Earth’s surface, there is a need to monitor TOCAs and EUV doses. In this paper we investigated the trend of TOCAs and EUV doses, the effects of annual and solar cycles on TOCAs, as well as the link between lightning and ozone production in the equatorial African belt. We also compared clear-sky simulated EUV doses with the corresponding EUV doses derived from TOMS measurements. The TOCAs were found to vary in the ranges 243 DU − 289 DU, 231 DU − 286 DU, and 236 DU − 296 DU, with mean values of 266.9 DU, 260.9 DU, and 267.8 DU for Dar-es-Salaam, Kampala and Serrekunda, respectively. Daily TOCA time series indicated that Kampala had the lowest TOCA values, which we attributed to the altitude effect. There were two annual ozone peaks in Dar-es-Salaam and Kampala, and one annual ozone peak in Serrekunda. The yearly TOCA averages showed an oscillation within a five-year period. We also found that the EUV doses were stable at all three locations for the period 1979−2000, and that Kampala and Dar-es-Salaam were mostly cloudy throughout the year, whereas Serrekunda was mostly free from clouds. It was also found that clouds were among the major factors determining the level of EUV reaching the Earth´s surface. Finally, we noted that during rainy seasons, horizontal advection effects augmented by lightning activity may be responsible for enhanced ozone production in the tropics.

  18. Measurements of the thermal neutron flux for an accelerator-based photoneutron source.

    Science.gov (United States)

    Taheri, Ali; Pazirandeh, Ali

    2016-12-01

    To have access to an appropriate neutron source is one of the most demanding requirements for neutron studies. This is important specially in laboratory and clinical applications, which need more compact and accessible sources. The most known neutron sources are fission reactors and natural isotopes, but there is an increasing interest for using accelerator based neutron sources because of their advantages. In this paper, we shall present a photo-neutron source prototype which is designed and fabricated to be used for different neutron researches including in-laboratory neutron activation analysis and neutron imaging, and also preliminary studies in boron neutron capture therapy (BNCT). Series of experimental tests were conducted to examine the intensity and quality of the neutron field produced by this source. Monte-Carlo simulations were also utilized to provide more detailed evaluation of the neutron spectrum, and determine the accuracy of the experiments. The experiments demonstrated a thermal neutron flux in the order of 10(7) (n/cm(2).s), while simulations affirmed this flux and showed a neutron spectrum with a sharp peak at thermal energy region. According to the results, about 60 % of produced neutrons are in the range of thermal to epithermal neutrons.

  19. Autonomous Micro-Air-Vehicle Control Based on Visual Sensing for Odor Source Localization

    Directory of Open Access Journals (Sweden)

    Kenzo Kurotsuchi

    2017-07-01

    Full Text Available In this paper, we propose a novel control method for autonomous-odor-source localization using visual and odor sensing by micro air vehicles (MAVs. Our method is based on biomimetics, which enable highly autonomous localization. Our method does not need any instruction signals, including even global positioning system (GPS signals. An experimenter simply blows a whistle, and the MAV will then start to hover, to seek an odor source, and to keep hovering near the source. The GPS-signal-free control based on visual sense enables indoor/underground use. Moreover, the MAV is light-weight (85 grams and does not cause harm to others even if it accidentally falls. Experiments conducted in the real world were successful in enabling odor source localization using the MAV with a bio-inspired searching method. The distance error of the localization was 63 cm, more accurate than the target distance of 120 cm for individual identification. Our odor source localization is the first step to a proof of concept for a danger warning system. These localization experiments were the first step to a proof of concept for a danger warning system to enable a safer and more secure society.

  20. Monte Carlo-based dose calculation for 32 P patch source for superficial brachytherapy applications

    Directory of Open Access Journals (Sweden)

    Sridhar Sahoo

    2015-01-01

    Full Text Available Skin cancer treatment involving 32 P source is an easy, less expensive method of treatment limited to small and superficial lesions of approximately 1 mm deep. Bhabha Atomic Research Centre (BARC has indigenously developed 32 P nafion-based patch source (1 cm Χ 1 cm for treating skin cancer. For this source, the values of dose per unit activity at different depths including dose profiles in water are calculated using the EGSnrc-based Monte Carlo code system. For an initial activity of 1 Bq distributed in 1 cm 2 surface area of the source, the calculated central axis depth dose values are 3.62 Χ 10 -10 GyBq -1 and 8.41 Χ 10 -11 GyBq -1 at 0.0125 and 1 mm depths in water, respectively. Hence, the treatment time calculated for delivering therapeutic dose of 30 Gy at 1 mm depth along the central axis of the source involving 37 MBq activity is about 2.7 hrs.

  1. Gearbox Fault Diagnosis in a Wind Turbine Using Single Sensor Based Blind Source Separation

    Directory of Open Access Journals (Sweden)

    Yuning Qian

    2016-01-01

    Full Text Available This paper presents a single sensor based blind source separation approach, namely, the wavelet-assisted stationary subspace analysis (WSSA, for gearbox fault diagnosis in a wind turbine. Continuous wavelet transform (CWT is used as a preprocessing tool to decompose a single sensor measurement data into a set of wavelet coefficients to meet the multidimensional requirement of the stationary subspace analysis (SSA. The SSA is a blind source separation technique that can separate the multidimensional signals into stationary and nonstationary source components without the need for independency and prior information of the source signals. After that, the separated nonstationary source component with the maximum kurtosis value is analyzed by the enveloping spectral analysis to identify potential fault-related characteristic frequencies. Case studies performed on a wind turbine gearbox test system verify the effectiveness of the WSSA approach and indicate that it outperforms independent component analysis (ICA and empirical mode decomposition (EMD, as well as the spectral-kurtosis-based enveloping, for wind turbine gearbox fault diagnosis.

  2. Design of 6 Mev linear accelerator based pulsed thermal neutron source: FLUKA simulation and experiment

    Energy Technology Data Exchange (ETDEWEB)

    Patil, B.J., E-mail: bjp@physics.unipune.ac.in [Department of Physics, University of Pune, Pune 411 007 (India); Chavan, S.T.; Pethe, S.N.; Krishnan, R. [SAMEER, IIT Powai Campus, Mumbai 400 076 (India); Bhoraskar, V.N. [Department of Physics, University of Pune, Pune 411 007 (India); Dhole, S.D., E-mail: sanjay@physics.unipune.ac.in [Department of Physics, University of Pune, Pune 411 007 (India)

    2012-01-15

    The 6 MeV LINAC based pulsed thermal neutron source has been designed for bulk materials analysis. The design was optimized by varying different parameters of the target and materials for each region using FLUKA code. The optimized design of thermal neutron source gives flux of 3 Multiplication-Sign 10{sup 6}ncm{sup -2}s{sup -1} with more than 80% of thermal neutrons and neutron to gamma ratio was 1 Multiplication-Sign 10{sup 4}ncm{sup -2}mR{sup -1}. The results of prototype experiment and simulation are found to be in good agreement with each other. - Highlights: Black-Right-Pointing-Pointer The optimized 6 eV linear accelerator based thermal neutron source using FLUKA simulation. Black-Right-Pointing-Pointer Beryllium as a photonuclear target and reflector, polyethylene as a filter and shield, graphite as a moderator. Black-Right-Pointing-Pointer Optimized pulsed thermal neutron source gives neutron flux of 3 Multiplication-Sign 10{sup 6} n cm{sup -2} s{sup -1}. Black-Right-Pointing-Pointer Results of the prototype experiment were compared with simulations and are found to be in good agreement. Black-Right-Pointing-Pointer This source can effectively be used for the study of bulk material analysis and activation products.

  3. Full-sun synchronic EUV and coronal hole mapping using multi-instrument images: Data and software made available

    Science.gov (United States)

    Caplan, R. M.; Downs, C.; Linker, J.

    2015-12-01

    A method for the automatic generation of EUV and coronal hole (CH) maps using simultaneous multi-instrument imaging data is described. Synchronized EUV images from STEREO/EUVI A&B 195Å and SDO/AIA 193Å undergo preprocessing steps that include PSF-deconvolution and the application of nonlinear data-derived intensity corrections that account for center-to-limb variations (limb-brightening) and inter-instrument intensity normalization. The latter two corrections are derived using a robust, systematic approach that takes advantage of unbiased long-term averages of data and serve to flatten the images by converting all pixel intensities to a unified disk center equivalent. While the number of applications are broad, we demonstrate how this technique is very useful for CH detection as it enables the use of a fast and simplified image segmentation algorithm to obtain consistent detection results. The multi-instrument nature of the technique also allows one to track evolving features consistently for longer periods than is possible with a single instrument, and preliminary results quantifying CH area and shape evolution are shown.Most importantly, several data and software products are made available to the community for use. For the ~4 year period of 6/10/2010 to 8/18/2014, we provide synchronic EUV and coronal hole maps at 6-hour cadence as well as the data-derived limb brightening and inter-instrument correction factors that we applied. We also make available a ready-to-use MATLAB script EUV2CHM used to generate the maps, which loads EUV images, applies our preprocessing steps, and then uses our GPU-accelerated/CPU-multithreaded segmentation algorithm EZSEG to detect coronal holes.

  4. CO sub 2 sources for microalgae-based liquid fuel production

    Energy Technology Data Exchange (ETDEWEB)

    Feinberg, D.; Karpuk, M.

    1990-08-01

    Researchers in the Aquatic Species Program at the Solar Energy Research Institute are developing species of microalgae that have high percentages of lipids, or oils. These lipids can be extracted and converted to diesel fuel substitutes. Because microalgae need carbon dioxide (CO{sub 2}) as a nutrient, optimal microalgae growth occurs in CO{sub 2}-saturated solutions. For this reason, the authors of this study sought to identify possible large-scale sources of CO{sub 2} for microalgae-based liquid fuels production. The authors concluded that several such promising sources exist. 42 refs., 14 figs., 10 tabs.

  5. An open source browser-based software tool for graph drawing and visualisation

    OpenAIRE

    Vogt, Veit-Dieter

    2014-01-01

    In this research work we searched for open source libraries which supports graph drawing and visualisation and can run in a browser. Subsequent these libraries were evaluated to find out which one is the best for this task. The result was the d3.js is that library which has the greatest functionality, flexibility and customisability. Afterwards we developed an open source software tool where d3.js was included and which was written in JavaScript so that it can run browser-based. En este tr...

  6. iPhone forensics based on Macintosh open source and freeware tools

    Science.gov (United States)

    Höne, Thomas; Creutzburg, Reiner

    2011-02-01

    The aim of this article is to show the usefulness of Mac OS X based open source tools for forensic investigation of modern iPhones. It demonstrates how important data stored in the iPhone is investigated. Two different scenarios of investigations are presented that are well-suited for a forensics lab work in university. This work shows how to analyze an Apple iPhone using open source and freeware tools. Important data used in a forensics investigation, which are possibly stored on a mobile device are presented. Also the superstructure and functions of the iPhone are explained.

  7. WEB ENABLED OPEN SOURCE GIS BASED TOURIST INFORMATION SYSTEM FOR BHOPAL CITY

    OpenAIRE

    Sreejit S. Nair,; DR. S.K. KATIYAR

    2011-01-01

    With GIS gaining its foot as a decision support system, its use is gaining relevance, but high cost of commercial GIS software hinders the growth. On the other hand the Free/Open Source Software (FOSS) has opened up a gateway for many budget restricted institutions & users to venture into GIS development. This research paper assesses the possibility of using Open Source GIS (OS GIS) based software’s to create a low cost GIS project and to publish the same over internet using free Web GIS soft...

  8. Robust all-source positioning of UAVs based on belief propagation

    Science.gov (United States)

    Chen, Xi; Gao, Wenyun; Wang, Jiabo

    2013-12-01

    For unmanned air vehicles (UAVs) to survive hostile operational environments, it is always preferable to utilize all wireless positioning sources available to fuse a robust position. While belief propagation is a well-established method for all source data fusion, it is not an easy job to handle all the mathematics therein. In this work, a comprehensive mathematical framework for belief propagation-based all-source positioning of UAVs is developed, taking wireless sources including Global Navigation Satellite Systems (GNSS) space vehicles, peer UAVs, ground control stations, and signal of opportunities. Based on the mathematical framework, a positioning algorithm named Belief propagation-based Opportunistic Positioning of UAVs (BOPU) is proposed, with an unscented particle filter for Bayesian approximation. The robustness of the proposed BOPU is evaluated by a fictitious scenario that a group of formation flying UAVs encounter GNSS countermeasures en route. Four different configurations of measurements availability are simulated. The results show that the performance of BOPU varies only slightly with different measurements availability.

  9. An accelerator-based epithermal photoneutron source for boron neutron capture therapy

    Energy Technology Data Exchange (ETDEWEB)

    Mitchell, Hannah E. [Georgia Inst. of Technology, Atlanta, GA (United States)

    1996-04-01

    Boron neutron capture therapy is an experimental binary cancer radiotherapy modality in which a boronated pharmaceutical that preferentially accumulates in malignant tissue is first administered, followed by exposing the tissue in the treatment volume to a thermal neutron field. Current usable beams are reactor-based but a viable alternative is the production of an epithermal neutron beam from an accelerator. Current literature cites various proposed accelerator-based designs, most of which are based on proton beams with beryllium or lithium targets. This dissertation examines the efficacy of a novel approach to BNCT treatments that incorporates an electron linear accelerator in the production of a photoneutron source. This source may help to resolve some of the present concerns associated with accelerator sources, including that of target cooling. The photoneutron production process is discussed as a possible alternate source of neutrons for eventual BNCT treatments for cancer. A conceptual design to produce epithermal photoneutrons by high photons (due to bremsstrahlung) impinging on deuterium targets is presented along with computational and experimental neutron production data. A clinically acceptable filtered epithermal neutron flux on the order of 107 neutrons per second per milliampere of electron current is shown to be obtainable. Additionally, the neutron beam is modified and characterized for BNCT applications by employing two unique moderating materials (an Al/AlF3 composite and a stacked Al/Teflon design) at various incident electron energies.

  10. VCSEL-based swept source for low-cost optical coherence tomography.

    Science.gov (United States)

    Moon, Sucbei; Choi, Eun Seo

    2017-02-01

    We present a novel wavelength-swept laser source for optical coherence tomography (OCT) which is based on the conventional laser diode technology of the vertical-cavity surface-emitting laser (VCSEL). In our self-heating sweep VCSEL (SS-VCSEL), a VCSEL device is simply driven by ramped pulses of currents in direct intensity modulation. The intrinsic property of VCSEL produces a frequency-swept output through the self-heating effect. By the injected current, the temperature of the active region is gradually increased in this effect. Consequently, it changes the wavelength of the laser output by itself. In this study, various characteristics of our SS-VCSEL were experimentally investigated for low-cost instrumentation of a swept source OCT system. A low-cost SS-VCSEL-based OCT system was demonstrated in this research that provided an axial resolution of 135 μm in air, sensitivity of -91 dB and a maximum imaging range longer than 10 cm when our source was operated at a sweep repetition rate of 5 kHz with an output power of 0.41 mW. Based on the experimental observations, we believe that our SS-VCSEL swept source can be an economic alternative in some of low-cost or long-range applications of OCT.

  11. MOSES: A Matlab-based open-source stochastic epidemic simulator.

    Science.gov (United States)

    Varol, Huseyin Atakan

    2016-08-01

    This paper presents an open-source stochastic epidemic simulator. Discrete Time Markov Chain based simulator is implemented in Matlab. The simulator capable of simulating SEQIJR (susceptible, exposed, quarantined, infected, isolated and recovered) model can be reduced to simpler models by setting some of the parameters (transition probabilities) to zero. Similarly, it can be extended to more complicated models by editing the source code. It is designed to be used for testing different control algorithms to contain epidemics. The simulator is also designed to be compatible with a network based epidemic simulator and can be used in the network based scheme for the simulation of a node. Simulations show the capability of reproducing different epidemic model behaviors successfully in a computationally efficient manner.

  12. Sampling-based correlation estimation for distributed source coding under rate and complexity constraints.

    Science.gov (United States)

    Cheung, Ngai-Man; Wang, Huisheng; Ortega, Antonio

    2008-11-01

    In many practical distributed source coding (DSC) applications, correlation information has to be estimated at the encoder in order to determine the encoding rate. Coding efficiency depends strongly on the accuracy of this correlation estimation. While error in estimation is inevitable, the impact of estimation error on compression efficiency has not been sufficiently studied for the DSC problem. In this paper,we study correlation estimation subject to rate and complexity constraints, and its impact on coding efficiency in a DSC framework for practical distributed image and video applications. We focus on, in particular, applications where binary correlation models are exploited for Slepian-Wolf coding and sampling techniques are used to estimate the correlation, while extensions to other correlation models would also be briefly discussed. In the first part of this paper, we investigate the compression of binary data. We first propose a model to characterize the relationship between the number of samples used in estimation and the coding rate penalty, in the case of encoding of a single binary source. The model is then extended to scenarios where multiple binary sources are compressed, and based on the model we propose an algorithm to determine the number of samples allocated to different sources so that the overall rate penalty can be minimized, subject to a constraint on the total number of samples. The second part of this paper studies compression of continuous valued data. We propose a model-based estimation for the particular but important situations where binary bit-planes are extracted from a continuous-valued input source, and each bit-plane is compressed using DSC. The proposed model-based method first estimates the source and correlation noise models using continuous valued samples, and then uses the models to derive the bit-plane statistics analytically. We also extend the model-based estimation to the cases when bit-planes are extracted based on the

  13. New source-moderator geometry to improve performance of {sup 252}Cf and {sup 241}Am-Be source-based PGNAA setups

    Energy Technology Data Exchange (ETDEWEB)

    Naqvi, A.A. [Department of Physics, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia)]. E-mail: aanaqvi@kfupm.edu.sa; Abdelmonem, M.S. [Department of Physics, King Fahd University of Petroleum and Minerals, Dhahran 31261 (Saudi Arabia); Al-Misned, Ghada [Girls Education College, Riyadh Girls Colleges, Riyadh (Saudi Arabia); Al-Ghamdi, Hanan [Girls Education College, Riyadh Girls Colleges, Riyadh (Saudi Arabia)

    2006-06-15

    The gamma ray yield from a {sup 252}Cf and a {sup 241}Am-Be source-based Prompt Gamma Ray Activation Analysis (PGNAA) setup has been observed to increase with enclosing their neutrons sources in a high-density polyethylene moderator. The prompt gamma rays yield from both setups depends upon the moderator length and the source position in it. For both setups, the optimum moderator length is found to be 7 cm. The optimum position of the neutron source inside moderator of the {sup 252}Cf and the {sup 241}Am-Be source-based PGNAA setups was found to be at a distance of 0.5 and 0.75 cm from the moderator-end facing the sample, respectively. Due to enclosure of the source in the moderator, about three-fold increase has been observed in the yield of prompt gamma rays from a Portland cement sample of a {sup 252}Cf and a {sup 241}Am-Be source-based PGNAA setups.

  14. Nanoscale Imaging Using Coherent and Incoherent Laboratory Based Soft X-Ray Sources

    Science.gov (United States)

    Stiel, H.; Dehlinger, A.; Janulewicz, K. A.; Jung, R.; Legall, H.; Pratsch, C.; Seim, C.; Tümmler, J.

    Nanoscale imaging of biological samples in the lab as well as mask inspection in extreme ultraviolet lithography near the production line with sub 30 nm resolution require high spectral brightness soft x-ray sources. Laser produced plasma (LPP) sources and plasma based X-ray lasers (XRL) emit soft X-ray radiation in the wavelength region of interest between 2 and 20 nm. Whereas LPP sources easily can be tuned to the so called water window (2.2-4.4 nm) the output of an XRL is restricted to relatively few fixed wavelengths in the extreme ultraviolet range. However due to the relatively high degree of coherence the XRL is well suited also for nanoscale imaging using coherent techniques like coherent diffraction imaging or Fourier transform holography.

  15. Polarized γ source based on Compton backscattering in a laser cavity

    Directory of Open Access Journals (Sweden)

    V. Yakimenko

    2006-09-01

    Full Text Available We propose a novel gamma source suitable for generating a polarized positron beam for the next generation of electron-positron colliders, such as the International Linear Collider (ILC, and the Compact Linear Collider (CLIC. This 30-MeV polarized gamma source is based on Compton scattering inside a picosecond CO_{2} laser cavity generated from electron bunches produced by a 4-GeV linac. We identified and experimentally verified the optimum conditions for obtaining at least one gamma photon per electron. After multiplication at several consecutive interaction points, the circularly polarized gamma rays are stopped on a target, thereby creating copious numbers of polarized positrons. We address the practicality of having an intracavity Compton-polarized positron source as the injector for these new colliders.

  16. Z-Source-Inverter-Based Flexible Distributed Generation System Solution for Grid Power Quality Improvement

    DEFF Research Database (Denmark)

    Blaabjerg, Frede; Vilathgamuwa, D. M.; Loh, Poh Chiang

    2009-01-01

    . The unused or remaining capacity of the converters could be used to provide some ancillary functions like harmonic and unbalance mitigation of the power distribution system. As some of these DG sources have wide operating ranges, they need special power converters for grid interfacing. Being a single-stage...... buck-boost inverter, recently proposed Z-source inverter (ZSI) is a good candidate for future DG systems. This paper presents a controller design for a ZSI-based DG system to improve power quality of distribution systems. The proposed control method is tested with simulation results obtained using......Distributed generation (DG) systems are usually connected to the grid using power electronic converters. Power delivered from such DG sources depends on factors like energy availability and load demand. The converters used in power conversion do not operate with their full capacity all the time...

  17. Characterisation of an accelerator-based neutron source for BNCT versus beam energy

    CERN Document Server

    Agosteo, S; D'Errico, F; Nath, R; Tinti, R

    2002-01-01

    Neutron capture in sup 1 sup 0 B produces energetic alpha particles that have a high linear energy transfer in tissue. This results in higher cell killing and a higher relative biological effectiveness compared to photons. Using suitably designed boron compounds which preferentially localize in cancerous cells instead of healthy tissues, boron neutron capture therapy (BNCT) has the potential of providing a higher tumor cure rate within minimal toxicity to normal tissues. This clinical approach requires a thermal neutron source, generally a nuclear reactor, with a fluence rate sufficient to deliver tumorcidal doses within a reasonable treatment time (minutes). Thermal neutrons do not penetrate deeply in tissue, therefore BNCT is limited to lesions which are either superficial or otherwise accessible. In this work, we investigate the feasibility of an accelerator-based thermal neutron source for the BNCT of skin melanomas. The source was designed via MCNP Monte Carlo simulations of the thermalization of a fast ...

  18. Beam-based model of broad-band impedance of the Diamond Light Source

    Directory of Open Access Journals (Sweden)

    Victor Smaluk

    2015-06-01

    Full Text Available In an electron storage ring, the interaction between a single-bunch beam and a vacuum chamber impedance affects the beam parameters, which can be measured rather precisely. So we can develop beam-based numerical models of longitudinal and transverse impedances. At the Diamond Light Source (DLS to get the model parameters, a set of measured data has been used including current-dependent shift of betatron tunes and synchronous phase, chromatic damping rates, and bunch lengthening. A matlab code for multiparticle tracking has been developed. The tracking results and analytical estimations are quite consistent with the measured data. Since Diamond has the shortest natural bunch length among all light sources in standard operation, the studies of collective effects with short bunches are relevant to many facilities including next generation of light sources.

  19. Beam-based model of broad-band impedance of the Diamond Light Source

    Science.gov (United States)

    Smaluk, Victor; Martin, Ian; Fielder, Richard; Bartolini, Riccardo

    2015-06-01

    In an electron storage ring, the interaction between a single-bunch beam and a vacuum chamber impedance affects the beam parameters, which can be measured rather precisely. So we can develop beam-based numerical models of longitudinal and transverse impedances. At the Diamond Light Source (DLS) to get the model parameters, a set of measured data has been used including current-dependent shift of betatron tunes and synchronous phase, chromatic damping rates, and bunch lengthening. A matlab code for multiparticle tracking has been developed. The tracking results and analytical estimations are quite consistent with the measured data. Since Diamond has the shortest natural bunch length among all light sources in standard operation, the studies of collective effects with short bunches are relevant to many facilities including next generation of light sources.

  20. Localization of Near-Field Sources Based on Sparse Signal Reconstruction with Regularization Parameter Selection

    Directory of Open Access Journals (Sweden)

    Shuang Li

    2017-01-01

    Full Text Available Source localization using sensor array in the near-field is a two-dimensional nonlinear parameter estimation problem which requires jointly estimating the two parameters: direction-of-arrival and range. In this paper, a new source localization method based on sparse signal reconstruction is proposed in the near-field. We first utilize l1-regularized weighted least-squares to find the bearings of sources. Here, the weight is designed by making use of the probability distribution of spatial correlations among symmetric sensors of the array. Meanwhile, a theoretical guidance for choosing a proper regularization parameter is also presented. Then one well-known l1-norm optimization solver is employed to estimate the ranges. The proposed method has a lower variance and higher resolution compared with other methods. Simulation results are given to demonstrate the superior performance of the proposed method.