WorldWideScience

Sample records for euv source based

  1. Plasma-based EUV light source

    Science.gov (United States)

    Shumlak, Uri; Golingo, Raymond; Nelson, Brian A.

    2010-11-02

    Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

  2. Study of crystalline thin films and nanofibers by means of the laser–plasma EUV-source based microscopy

    International Nuclear Information System (INIS)

    Wachulak, P.W.; Bartnik, A.; Baranowska-Korczyc, A.; Pánek, D.; Brůža, P.; Kostecki, J.; Węgrzyński, Ł.; Jarocki, R.; Szczurek, M.; Fronc, K.; Elbaum, D.; Fiedorowicz, H.

    2013-01-01

    New developments in nanoscience and nanotechnology require nanometer scale resolution imaging tools and techniques such as an extreme ultraviolet (EUV) and soft X-ray (SXR) microscopy, based on Fresnel zone plates. In this paper, we report on applications of a desk-top microscopy using a laser-plasma EUV source based on a gas-puff target for studies of morphology of thin silicon membranes coated with NaCl crystals and samples composed of ZnO nanofibers

  3. EUV sources for the alpha-tools

    Science.gov (United States)

    Pankert, Joseph; Apetz, Rolf; Bergmann, Klaus; Damen, Marcel; Derra, Günther; Franken, Oliver; Janssen, Maurice; Jonkers, Jeroen; Klein, Jürgen; Kraus, Helmar; Krücken, Thomas; List, Andreas; Loeken, Micheal; Mader, Arnaud; Metzmacher, Christof; Neff, Willi; Probst, Sven; Prümmer, Ralph; Rosier, Oliver; Schwabe, Stefan; Seiwert, Stefan; Siemons, Guido; Vaudrevange, Dominik; Wagemann, Dirk; Weber, Achim; Zink, Peter; Zitzen, Oliver

    2006-03-01

    In this paper, we report on the recent progress of the Philips Extreme UV source. The Philips source concept is based on a discharge plasma ignited in a Sn vapor plume that is ablated by a laser pulse. Using rotating electrodes covered with a regenerating tin surface, the problems of electrode erosion and power scaling are fundamentally solved. Most of the work of the past year has been dedicated to develop a lamp system which is operating very reliably and stable under full scanner remote control. Topics addressed were the development of the scanner interface, a dose control system, thermo-mechanical design, positional stability of the source, tin handling, and many more. The resulting EUV source-the Philips NovaTin(R) source-can operate at more than 10kW electrical input power and delivers 200W in-band EUV into 2π continuously. The source is very small, so nearly 100% of the EUV radiation can be collected within etendue limits. The lamp system is fully automated and can operate unattended under full scanner remote control. 500 Million shots of continuous operation without interruption have been realized, electrode lifetime is at least 2 Billion shots. Three sources are currently being prepared, two of them will be integrated into the first EUV Alpha Demonstration tools of ASML. The debris problem was reduced to a level which is well acceptable for scanner operation. First, a considerable reduction of the Sn emission of the source has been realized. The debris mitigation system is based on a two-step concept using a foil trap based stage and a chemical cleaning stage. Both steps were improved considerably. A collector lifetime of 1 Billion shots is achieved, after this operating time a cleaning would be applied. The cleaning step has been verified to work with tolerable Sn residues. From the experimental results, a total collector lifetime of more than 10 Billion shots can be expected.

  4. Plasma sources for EUV lithography exposure tools

    International Nuclear Information System (INIS)

    Banine, Vadim; Moors, Roel

    2004-01-01

    The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil extremely high demands both technical and cost oriented. The EUVL tool operates at a wavelength in the range 13-14 nm, which requires a major re-thinking of state-of-the-art lithography systems operating in the DUV range. The light production mechanism changes from conventional lamps and lasers to relatively high temperature emitting plasmas. The light transport, mainly refractive for DUV, should become reflective for EUV. The source specifications are derived from the customer requirements for the complete tool, which are: throughput, cost of ownership (CoO) and imaging quality. The EUVL system is considered as a follow up of the existing DUV based lithography technology and, while improving the feature resolution, it has to maintain high wafer throughput performance, which is driven by the overall CoO picture. This in turn puts quite high requirements on the collectable in-band power produced by an EUV source. Increased, due to improved feature resolution, critical dimension (CD) control requirements, together with reflective optics restrictions, necessitate pulse-to-pulse repeatability, spatial stability control and repetition rates, which are substantially better than those of current optical systems. All together the following aspects of the source specification will be addressed: the operating wavelength, the EUV power, the hot spot size, the collectable angle, the repetition rate, the pulse-to-pulse repeatability and the debris induced lifetime of components

  5. Physical processes in EUV sources for microlithography

    International Nuclear Information System (INIS)

    Banine, V Y; Swinkels, G H P M; Koshelev, K N

    2011-01-01

    The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil very high demands both technical and cost oriented. The EUVL tool operates at a wavelength of 13.5 nm, which requires the following new developments. - The light production mechanism changes from conventional lamps and lasers to relatively high-temperature emitting plasmas. - The light transport, mainly refractive for deep ultraviolet (DUV), should be reflective for EUV. - The source specifications as derived from the customer requirements on wafer throughput mean that the output EUV source power has to be hundreds of watts. This in its turn means that tens to hundreds of kilowatts of dissipated power has to be managed in a relatively small volume. - In order to keep lithography costs as low as possible, the lifetime of the components should be as long as possible and at least of the order of thousands of hours. This poses a challenge for the sources, namely how to design and manufacture components robust enough to withstand the intense environment of high heat dissipation, flows of several keV ions as well as the atomic and particular debris within the source vessel. - As with all lithography tools, the imaging requirements demand a narrow illumination bandwidth. Absorption of materials at EUV wavelengths is extreme with extinguishing lengths of the order of tens of nanometres, so the balance between high transmission and spectral purity requires careful engineering. All together, EUV lithography sources present technological challenges in various fields of physics such as plasma, optics and material science. These challenges are being tackled by the source manufacturers and investigated extensively in the research facilities around the world. An overview of the published results on the topic as well as the analyses of the physical processes behind the proposed solutions will be presented in this paper. (topical review)

  6. Performance of 100-W HVM LPP-EUV source

    Science.gov (United States)

    Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu; Nowak, Krzysztof M.; Kawasuji, Yasufumi; Tanaka, Hiroshi; Watanabe, Yukio; Hori, Tsukasa; Kodama, Takeshi; Shiraishi, Yutaka; Yanagida, Tatsuya; Soumagne, Georg; Yamada, Tsuyoshi; Yamazaki, Taku; Okazaki, Shinji; Saitou, Takashi

    2015-08-01

    At Gigaphoton Inc., we have developed unique and original technologies for a carbon dioxide laser-produced tin plasma extreme ultraviolet (CO2-Sn-LPP EUV) light source, which is the most promising solution for high-power high-volume manufacturing (HVM) EUV lithography at 13.5 nm. Our unique technologies include the combination of a pulsed CO2 laser with Sn droplets, the application of dual-wavelength laser pulses for Sn droplet conditioning, and subsequent EUV generation and magnetic field mitigation. Theoretical and experimental data have clearly shown the advantage of our proposed strategy. Currently, we are developing the first HVM light source, `GL200E'. This HVM light source will provide 250-W EUV power based on a 20-kW level pulsed CO2 laser. The preparation of a high average-power CO2 laser (more than 20 kW output power) has been completed in cooperation with Mitsubishi Electric Corporation. Recently, we achieved 140 W at 50 kHz and 50% duty cycle operation as well as 2 h of operation at 100 W of power level. Further improvements are ongoing. We will report the latest status and the challenge to reach stable system operation of more than 100 W at about 4% conversion efficiency with 20-μm droplets and magnetic mitigation.

  7. Performance of one hundred watt HVM LPP-EUV source

    Science.gov (United States)

    Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu; Nowak, Krzysztof M.; Kawasuji, Yasufumi; Tanaka, Hiroshi; Watanabe, Yukio; Hori, Tsukasa; Kodama, Takeshi; Shiraishi, Yutaka; Yanagida, Tatsuya; Soumagne, Georg; Yamada, Tsuyoshi; Yamazaki, Taku; Okazaki, Shinji; Saitou, Takashi

    2015-03-01

    We have been developing CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL. Unique and original technologies such as: combination of pulsed CO2 laser and Sn droplets, dual wavelength laser pulses shooting, and mitigation with magnetic field, have been developed in Gigaphoton Inc. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. Based on these data we are developing first practical source for HVM - "GL200E". This data means 250W EUV power will be able to realize around 20kW level pulsed CO2 laser. We have reported engineering data from our recent test such around 43W average clean power, CE=2.0%, with 100kHz operation and other data 19). We have already finished preparation of higher average power CO2 laser more than 20kW at output power cooperate with Mitsubishi Electric Corporation 14). Recently we achieved 92W with 50kHz, 50% duty cycle operation 20). We have reported component technology progress of EUV light source system. We report promising experimental data and result of simulation of magnetic mitigation system in Proto #1 system. We demonstrated several data with Proto #2 system: (1) emission data of 140W in burst under 70kHz 50% duty cycle during 10 minutes. (2) emission data of 118W in burst under 60kHz 70% duty cycle during 10 minutes. (3) emission data of 42W in burst under 20kHz 50% duty cycle (10000pls/0.5ms OFF) during 3 hours (110Mpls). Also we report construction of Pilot #1 system. Final target is week level operation with 250W EUV power with CE=4%, more than 27kW CO2 laser power by the end of Q2 of 2015.

  8. Discharge plasmas as EUV Sources for Future Micro Lithography

    Science.gov (United States)

    Kruecken, Thomas

    2007-08-01

    Future extreme ultraviolet (EUV) lithography will require very high radiation intensities in a narrow wavelength range around 13.5 nm, which is most efficiently emitted as line radiation by highly ionized heavy particles. Currently the most intense EUV sources are based on xenon or tin gas discharges. After having investigated the limits of a hollow cathode triggered xenon pinch discharge Philips Extreme UV favors a laser triggered tin vacuum spark discharge. Plasma and radiation properties of these highly transient discharges will be compared. Besides simple MHD-models the ADAS software package has been used to generate important atomic and spectral data of the relevant ion stages. To compute excitation and radiation properties, collisional radiative equilibria of individual ion stages are computed. For many lines opacity effects cannot be neglected. In the xenon discharges the optical depths allow for a treatment based on escape factors. Due to the rapid change of plasma parameters the abundancies of the different ionization stages must be computed dynamically. This requires effective ionization and recombination rates, which can also be supplied by ADAS. Due to very steep gradients (up to a couple orders of magnitude per mm) the plasma of tin vacuum spark discharges is very complicated. Therefore we shall describe here only some technological aspects of our tin EUV lamp: The electrode system consists of two rotating which are pulled through baths of molten tin such that a tin film remains on their surfaces. With a laser pulse some tin is ablated from one of the wheels and travels rapidly through vacuum towards the other rotating wheel. When the tin plasma reaches the other electrodes it ignites and the high current phase starts, i.e. the capacitor bank is unloaded, the plasma is pinched and EUV is radiated. Besides the good spectral properties of tin this concept has some other advantages: Erosion of electrodes is no severe problem as the tin film is

  9. A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength

    Czech Academy of Sciences Publication Activity Database

    Wachulak, P.W.; Bartnik, A.; Fiedorowicz, H.; Feigl, T.; Jarocki, R.; Kostecki, J.; Rudawski, P.; Sawicka, Magdalena; Szczurek, M.; Szczurek, A.; Zawadzki, Z.

    2010-01-01

    Roč. 100, č. 3 (2010), 461-469 ISSN 0946-2171 Institutional research plan: CEZ:AV0Z10100523 Keywords : laser-plasma * EUV source * gas puff target * elliptical multi- layer * mirror * table-top setup Subject RIV: BH - Optics, Masers, Lasers Impact factor: 2.239, year: 2010

  10. EUV source development for high-volume chip manufacturing tools

    Science.gov (United States)

    Stamm, Uwe; Yoshioka, Masaki; Kleinschmidt, Jürgen; Ziener, Christian; Schriever, Guido; Schürmann, Max C.; Hergenhan, Guido; Borisov, Vladimir M.

    2007-03-01

    Xenon-fueled gas discharge produced plasma (DPP) sources were integrated into Micro Exposure Tools already in 2004. Operation of these tools in a research environment gave early learning for the development of EUV sources for Alpha and Beta-Tools. Further experiments with these sources were performed for basic understanding on EUV source technology and limits, especially the achievable power and reliability. The intermediate focus power of Alpha-Tool sources under development is measured to values above 10 W. Debris mitigation schemes were successfully integrated into the sources leading to reasonable collector mirror lifetimes with target of 10 billion pulses due to the effective debris flux reduction. Source collector mirrors, which withstand the radiation and temperature load of Xenon-fueled sources, have been developed in cooperation with MediaLario Technologies to support intermediate focus power well above 10 W. To fulfill the requirements for High Volume chip Manufacturing (HVM) applications, a new concept for HVM EUV sources with higher efficiency has been developed at XTREME technologies. The discharge produced plasma (DPP) source concept combines the use of rotating disk electrodes (RDE) with laser exited droplet targets. The source concept is called laser assisted droplet RDE source. The fuel of these sources has been selected to be Tin. The conversion efficiency achieved with the laser assisted droplet RDE source is 2-3x higher compared to Xenon. Very high pulse energies well above 200 mJ / 2π sr have been measured with first prototypes of the laser assisted droplet RDE source. If it is possible to maintain these high pulse energies at higher repetition rates a 10 kHz EUV source could deliver 2000 W / 2π sr. According to the first experimental data the new concept is expected to be scalable to an intermediate focus power on the 300 W level.

  11. Compact laser-produced plasma EUV sources for processing polymers and nanoimaging

    International Nuclear Information System (INIS)

    Fiedorowicz, H.; Bartnik, A.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Wachulak, P.

    2010-01-01

    Complete text of publication follows. Extreme ultraviolet (EUV) can be produced form a high-temperature plasma generated by interaction of high power laser pulses with matter. Laser plasma EUV sources are considered to be used in various applications in physics, material science, biomedicine, and technology. In the paper new compact laser plasma EUV sources developed for processing polymers and imaging are presented. The sources are based on a gas puff target formed by pulsed injection of a small amount of gas under high-pressure into a laser focus region. The use of the gas puff target instead of a solid target allows for efficient generation of EUV radiation without debris production. The compact laser plasma EUV source based on a gas puff target was developed for metrology applications. The EUV source developed for processing polymers is equipped with a grazing incidence axisymmetrical ellipsoidal mirror to focus EUV radiation in the relatively broad spectral range with the strong maximum near 10 nm. The size of the focal spot is about 1.3 mm in diameter with the maximum fluence up to 70 mJ/cm 2 . EUV radiation in the wavelength range of about 5 to 50 nm is produced by irradiation of xenon or krypton gas puff target with a Nd:YAG laser operating at 10 Hz and delivering 4 ns pulses of energy up to 0.8 J per pulse. The experiments on EUV irradiation of various polymers have been performed. Modification of polymer surfaces was achieved, primarily due to direct photo-etching with EUV photons and formation of micro- and nanostructures onto the surface. The mechanism of the interaction is similar to the UV laser ablation where energetic photons cause chemical bonds of the polymer chain to be broken. However, because of very low penetration depth of EUV radiation, the interaction region is limited to a very thin surface layer (<100 nm). This makes it possible to avoid degradation of bulk material caused by deeply penetrating UV radiation. The results of the studies

  12. Modular EUV Source for the next generation lithography

    International Nuclear Information System (INIS)

    Sublemontier, O.; Rosset-Kos, M.; Ceccotti, T.; Hergott, J.F.; Auguste, Th.; Normand, D.; Schmidt, M.; Beaumont, F.; Farcage, D.; Cheymol, G.; Le Caro, J.M.; Cormont, Ph.; Mauchien, P.; Thro, P.Y.; Skrzypczak, J.; Muller, S.; Marquis, E.; Barthod, B.; Gaurand, I.; Davenet, M.; Bernard, R.

    2011-01-01

    The present work, performed in the frame of the EXULITE project, was dedicated to the design and characterization of a laser-plasma-produced extreme ultraviolet (EUV) source prototype at 13.5 nm for the next generation lithography. It was conducted in cooperation with two laboratories from CEA, ALCATEL and THALES. One of our approach originalities was the laser scheme modularity. Six Nd:YAG laser beams were focused at the same time on a xenon filament jet to generate the EUV emitting plasma. Multiplexing has important industrial advantages and led to interesting source performances in terms of in-band power, stability and angular emission properties with the filament jet target. A maximum conversion efficiency (CE) value of 0.44% in 2π sr and 2% bandwidth was measured, which corresponds to a maximum in band EUV mean power of 7.7 W at a repetition rate of 6 kHz. The EUV emission was found to be stable and isotropic in these conditions. (authors)

  13. Overcoming etch challenges related to EUV based patterning (Conference Presentation)

    Science.gov (United States)

    Metz, Andrew W.; Cottle, Hongyun; Honda, Masanobu; Morikita, Shinya; Kumar, Kaushik A.; Biolsi, Peter

    2017-04-01

    Research and development activities related to Extreme Ultra Violet [EUV] defined patterning continue to grow for cost and extreme process control challenges of Self-Aligned Quad Patterning [SAQP] with continued momentum for EUV ecosystem readiness could provide cost advantages in addition to improved intra-level overlay performance relative to multiple patterning approaches. However, Line Edge Roughness [LER] and Line Width Roughness [LWR] performance of EUV defined resist images are still far from meeting technology needs or ITRS spec performance. Furthermore, extreme resist height scaling to mitigate flop over exacerbates the plasma etch trade-offs related to traditional approaches of PR smoothing, descum implementation and maintaining 2D aspect ratios of short lines or elliptical contacts concurrent with ultra-high photo resist [PR] selectivity. In this paper we will discuss sources of LER/LWR, impact of material choice, integration, and innovative plasma process techniques and describe how TELTM VigusTM CCP Etchers can enhance PR selectivity, reduce LER/LWR, and maintain 2D aspect ratio of incoming patterns. Beyond traditional process approaches this paper will show the utility of: [1] DC Superposition in enhancing EUV resist hardening and selectivity, increasing resistance to stress induced PR line wiggle caused by CFx passivation, and mitigating organic planarizer wiggle; [2] Quasi Atomic Layer Etch [Q-ALE] for ARC open eliminating the tradeoffs between selectivity, CD, and shrink ratio control; and [3] ALD+Etch FUSION technology for feature independent CD shrink and LER reduction. Applicability of these concepts back transferred to 193i based lithography is also confirmed.

  14. Nanoimaging using soft X-ray and EUV laser-plasma sources

    Science.gov (United States)

    Wachulak, Przemyslaw; Torrisi, Alfio; Ayele, Mesfin; Bartnik, Andrzej; Czwartos, Joanna; Węgrzyński, Łukasz; Fok, Tomasz; Fiedorowicz, Henryk

    2018-01-01

    In this work we present three experimental, compact desk-top imaging systems: SXR and EUV full field microscopes and the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources based on a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths are capable of imaging nanostructures with a sub-50 nm spatial resolution and short (seconds) exposure times. The SXR contact microscope operates in the "water-window" spectral range and produces an imprint of the internal structure of the imaged sample in a thin layer of SXR sensitive photoresist. Applications of such desk-top EUV and SXR microscopes, mostly for biological samples (CT26 fibroblast cells and Keratinocytes) are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.

  15. SCRIC: a code dedicated to the detailed emission and absorption of heterogeneous NLTE plasmas; application to xenon EUV sources; SCRIC: un code pour calculer l'absorption et l'emission detaillees de plasmas hors equilibre, inhomogenes et etendus; application aux sources EUV a base de xenon

    Energy Technology Data Exchange (ETDEWEB)

    Gaufridy de Dortan, F. de

    2006-07-01

    Nearly all spectral opacity codes for LTE and NLTE plasmas rely on configurations approximate modelling or even supra-configurations modelling for mid Z plasmas. But in some cases, configurations interaction (either relativistic and non relativistic) induces dramatic changes in spectral shapes. We propose here a new detailed emissivity code with configuration mixing to allow for a realistic description of complex mid Z plasmas. A collisional radiative calculation. based on HULLAC precise energies and cross sections. determines the populations. Detailed emissivities and opacities are then calculated and radiative transfer equation is resolved for wide inhomogeneous plasmas. This code is able to cope rapidly with very large amount of atomic data. It is therefore possible to use complex hydrodynamic files even on personal computers in a very limited time. We used this code for comparison with Xenon EUV sources within the framework of nano-lithography developments. It appears that configurations mixing strongly shifts satellite lines and must be included in the description of these sources to enhance their efficiency. (author)

  16. Surface modification by EUV laser beam based on capillary discharge

    Czech Academy of Sciences Publication Activity Database

    Frolov, Oleksandr; Koláček, Karel; Schmidt, Jiří; Štraus, Jaroslav; Prukner, Václav; Shukurov, A.

    -, č. 58 (2011), s. 484-487 ISSN 2010-376X. [International Conference on Fusion and Plasma Physics. Bali, Indonésie, 26.10.2011-28.10.2011] R&D Projects: GA AV ČR KAN300100702; GA MŠk LA08024; GA MŠk(CZ) LC528 Institutional research plan: CEZ:AV0Z20430508 Keywords : soft x-ray * EUV * laser * radiation * source * capillary * discharge * plasma * ablation * surface modification Subject RIV: BL - Plasma and Gas Discharge Physics http://www.waset.org/journals/waset/v58/v58-99.pdf

  17. Creation and investigation of powerful EUV sources (λ ∼ 13.5 nm)

    International Nuclear Information System (INIS)

    Borisov, V. M.; Borisova, G. N.; Vinokhodov, A. Yu.; Ivanov, A. S.; Kiryukhin, Yu. B.; Mishchenko, V. A.; Prokofiev, A. V.; Khristoforov, O. B.

    2010-01-01

    Results are presented from experimental studies of repetitively pulsed EUV (λ = 13.5 ± 0.135 nm) sources based on a laser-initiated discharge in tin vapor between rotating disk electrodes. Radiative characteristics of two sources with different systems of tin supply onto the electrode surface and different types of power supply have been compared. A number of new effects have been revealed at pulse repetition rates as high as ∼4000 Hz. A mean radiation power of 520 W into the 2π solid angle has been achieved in the spectral band 13.5 ± 0.135 nm at a deposited electrical power of 24 kW.

  18. Creation and investigation of powerful EUV sources (λ ≈ 13.5 nm)

    Science.gov (United States)

    Borisov, V. M.; Borisova, G. N.; Vinokhodov, A. Yu.; Ivanov, A. S.; Kiryukhin, Yu. B.; Mishchenko, V. A.; Prokofiev, A. V.; Khristoforov, O. B.

    2010-03-01

    Results are presented from experimental studies of repetitively pulsed EUV (λ = 13.5 ± 0.135 nm) sources based on a laser-initiated discharge in tin vapor between rotating disk electrodes. Radiative characteristics of two sources with different systems of tin supply onto the electrode surface and different types of power supply have been compared. A number of new effects have been revealed at pulse repetition rates as high as ˜4000 Hz. A mean radiation power of 520 W into the 2π solid angle has been achieved in the spectral band 13.5 ± 0.135 nm at a deposited electrical power of 24 kW.

  19. Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources

    NARCIS (Netherlands)

    Bayraktar, Muharrem; Bastiaens, Hubertus M.J.; Bruineman, Caspar; Vratzov, Boris; Bijkerk, Frederik

    2016-01-01

    Extreme ultraviolet (EUV) light sources and their optimization for emission within a narrow wavelength band are essential in applications such as photolithography. Most light sources however also emit radiation outside this wavelength band and have a spectrum extending up to deep ultraviolet (DUV)

  20. EQ-10 electrodeless Z-pinch EUV source for metrology applications

    Science.gov (United States)

    Gustafson, Deborah; Horne, Stephen F.; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

    2011-11-01

    With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

  1. Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications

    Science.gov (United States)

    Horne, Stephen F.; Gustafson, Deborah; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

    2011-04-01

    Now that EUV lithography systems are beginning to ship into the fabs for next generation chips it is more critical that the EUV infrastructure developments are keeping pace. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinch™ light source since 2005. The source is currently being used for metrology, mask inspection, and resist development. These applications require especially stable performance in both power and source size. Over the last 5 years Energetiq has made many source modifications which have included better thermal management as well as high pulse rate operation6. Recently we have further increased the system power handling and electrical pulse reproducibility. The impact of these modifications on source performance will be reported.

  2. Enhanced performance of an EUV light source (λ = 84 nm) using short-pulse excitation of a windowless dielectric barrier discharge in neon

    International Nuclear Information System (INIS)

    Carman, R J; Kane, D M; Ward, B K

    2010-01-01

    The electrical and optical characteristics of a dielectric barrier discharge (DBD) based neon excimer lamp generating output in the extreme ultraviolet (EUV) spectral range (λ = 84 nm) have been investigated experimentally. We report a detailed comparison of lamp performance for both pulsed and sinusoidal voltage excitation waveforms, using otherwise identical operating conditions. The results show that pulsed voltage excitation yields a ∼50% increase in the overall electrical to EUV conversion efficiency compared with sinusoidal waveforms, when operating in the pressure range 500-900 mbar. Pulsed operation allows greater control of parameters associated with the temporal evolution of the EUV pulse shapes (risetime, instantaneous peak power). The Ne DBD based source is also found to be highly monochromatic with respect to its spectral output from the second continuum band at λ ∼ 84 nm (5 nm FWHM). This continuum band dominates the spectral emission over the wavelength range 30-550 nm. Lamp performance; as measured by the overall EUV output energy, electrical to EUV conversion efficiency and spectral purity at λ ∼ 84 nm; improves with increasing gas pressure up to p = 900 mbar.

  3. INTERACTION OF LASER RADIATION WITH MATTER. LASER PLASMA High-power EUV (13.5 nm) light source

    Science.gov (United States)

    Borisov, Vladimir M.; Borisova, Galina N.; Vinokhodov, Aleksandr Yu; Zakharov, S. V.; Ivanov, Aleksandr S.; Kiryukhin, Yurii B.; Mishchenko, Valentin A.; Prokof'ev, Aleksandr V.; Khristoforov, Oleg B.

    2010-10-01

    Characteristics of a discharge-produced plasma (DPP) light source in the spectral band 13.5±0.135 nm, developed for Extreme Ultra Violet (EUV) lithography, are presented. EUV light is generated by DPP in tin vapour formed between rotating disk electrodes. The discharge is ignited by a focused laser beam. The EUV power 1000 W/(2π sr) in the spectral band 13.5±0.135 nm was achieved with input power about of ~63 kW to the plasma at a pulse repetition rate ~7 kHz . The results of numerical simulation are compared with the experimental data.

  4. Application of Laser Plasma Sources of Soft X-rays and Extreme Ultraviolet (EUV) in Imaging, Processing Materials and Photoionization Studies

    Science.gov (United States)

    Fiedorowicz, H.; Bartnik, A.; Wachulak, P. W.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Ahad, I. U.; Fok, T.; Szczurek, A.; Wȩgrzyński, Ł.

    In the paper we present new applications of laser plasma sources of soft X-rays and extreme ultraviolet (EUV) in various areas of plasma physics, nanotechnology and biomedical engineering. The sources are based on a gas puff target irradiated with nanosecond laser pulses from commercial Nd: YAG lasers, generating pulses with time duration from 1 to 10 ns and energies from 0.5 to 10 J at a 10 Hz repetition rate. The targets are produced with the use of a double valve system equipped with a special nozzle to form a double-stream gas puff target which allows for high conversion efficiency of laser energy into soft X-rays and EUV without degradation of the nozzle. The sources are equipped with various optical systems to collect soft X-ray and EUV radiation and form the radiation beam. New applications of these sources in imaging, including EUV tomography and soft X-ray microscopy, processing of materials and photoionization studies are presented.

  5. Laser-produced plasma EUV source using a colloidal microjet target containing tin dioxide nanoparticles

    Science.gov (United States)

    Higashiguchi, Takeshi; Dojyo, Naoto; Sasaki, Wataru; Kubodera, Shoichi

    2006-10-01

    We realized a low-debris laser-produced plasma extreme ultraviolet (EUV) source by use of a colloidal microjet target, which contained low-concentration (6 wt%) tin-dioxide nanoparticles. An Nd:YAG laser was used to produce a plasma at the intensity on the order of 10^11 W/cm^2. The use of low concentration nanoparticles in a microjet target with a diameter of 50 μm regulated the neutral debris emission from a target, which was monitored by a silicon witness plate placed 30 cm apart from the source in a vacuum chamber. No XPS signals of tin and/or oxygen atoms were observed on the plate after ten thousand laser exposures. The low concentration nature of the target was compensated and the conversion efficiency (CE) was improved by introducing double pulses of two Nd:YAG lasers operated at 532 and 1064 nm as a result of controlling the micro-plasma characteristics. The EUV CE reached its maximum of 1.2% at the delay time of approximately 100 ns with the main laser intensiy of 2 x10^11 W/cm^2. The CE value was comparable to that of a tin bulk target, which, however, produced a significant amount of neutral debris.

  6. EUV lithography

    CERN Document Server

    Bakshi, Vivek

    2018-01-01

    Extreme ultraviolet lithography (EUVL) is the principal lithography technology-beyond the current 193-nm-based optical lithography-aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL used in the field. Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In 2008, EUVL was a prime contender to replace 193-nm-based optical lithography in leading-edge computer chip making, but not everyone was convinced at that point. Switching from 193-nm to 13.5-nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography-light source, scanner, mask, mask handling, optics, optics metrology, resist, c...

  7. Reconstruction of the solar EUV irradiance from 1996 to 2010 based on SOHO/EIT images

    Directory of Open Access Journals (Sweden)

    Haberreiter Margit

    2014-01-01

    Full Text Available The solar Extreme UltraViolet (EUV spectrum has important effects on the Earth’s upper atmosphere. For a detailed investigation of these effects it is important to have a consistent data series of the EUV spectral irradiance available. We present a reconstruction of the solar EUV irradiance based on SOHO/EIT images, along with synthetic spectra calculated using different coronal features which represent the brightness variation of the solar atmosphere. The EIT images are segmented with the SPoCA2 tool which separates the features based on a fixed brightness classification scheme. With the SOLMOD code we then calculate intensity spectra for the 10–100 nm wavelength range and each of the coronal features. Weighting the intensity spectra with the area covered by each of the features yields the temporal variation of the EUV spectrum. The reconstructed spectrum is then validated against the spectral irradiance as observed with SOHO/SEM. Our approach leads to good agreement between the reconstructed and the observed spectral irradiance. This study is an important step toward understanding variations in the solar EUV spectrum and ultimately its effect on the Earth’s upper atmosphere.

  8. Lithographic measurement of EUV flare in the 0.3-NA Micro Exposure Tool optic at the Advanced Light Source

    International Nuclear Information System (INIS)

    Cain, Jason P.; Naulleau, Patrick; Spanos, Costas J.

    2005-01-01

    The level of flare present in a 0.3-NA EUV optic (the MET optic) at the Advanced Light Source at Lawrence Berkeley National Laboratory is measured using a lithographic method. Photoresist behavior at high exposure doses makes analysis difficult. Flare measurement analysis under scanning electron microscopy (SEM) and optical microscopy is compared, and optical microscopy is found to be a more reliable technique. In addition, the measured results are compared with predictions based on surface roughness measurement of the MET optical elements. When the fields in the exposure matrix are spaced far enough apart to avoid influence from surrounding fields and the data is corrected for imperfect mask contrast and aerial image proximity effects, the results match predicted values quite well. The amount of flare present in this optic ranges from 4.7% for 2 (micro)m features to 6.8% for 500 nm features

  9. EB and EUV lithography using inedible cellulose-based biomass resist material

    Science.gov (United States)

    Takei, Satoshi; Hanabata, Makoto; Oshima, Akihiro; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi

    2016-03-01

    The validity of our approach of inedible cellulose-based resist material derived from woody biomass has been confirmed experimentally for the use of pure water in organic solvent-free water spin-coating and tetramethylammonium hydroxide(TMAH)-free water-developable techniques of eco-conscious electron beam (EB) and extreme-ultraviolet (EUV) lithography. The water developable, non-chemically amplified, high sensitive, and negative tone resist material in EB and EUV lithography was developed for environmental affair, safety, easiness of handling, and health of the working people. The inedible cellulose-based biomass resist material was developed by replacing the hydroxyl groups in the beta-linked disaccharides with EB and EUV sensitive groups. The 50-100 nm line and space width, and little footing profiles of cellulose-based biomass resist material on hardmask and layer were resolved at the doses of 10-30 μC/cm2. The eco-conscious lithography techniques was referred to as green EB and EUV lithography using inedible cellulose-based biomass resist material.

  10. Analytical techniques for mechanistic characterization of EUV photoresists

    Science.gov (United States)

    Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

    2017-03-01

    Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

  11. Fundamentals of EUV resist-inorganic hardmask interactions

    Science.gov (United States)

    Goldfarb, Dario L.; Glodde, Martin; De Silva, Anuja; Sheshadri, Indira; Felix, Nelson M.; Lionti, Krystelle; Magbitang, Teddie

    2017-03-01

    High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardmasks (HMs) as etch transfer layers for EUV patterning. Ultrathin (<5nm) inorganic HMs can provide higher etch selectivity, lower post-etch LWR, decreased defectivity and wet strippability compared to spin-on hybrid HMs (e.g., SiARC), however such novel layers can induce resist adhesion failure and resist residue. Therefore, a fundamental understanding of EUV resist-inorganic HM interactions is needed in order to optimize the EUV resist interfacial behavior. In this paper, novel materials and processing techniques are introduced to characterize and improve the EUV resist-inorganic HM interface. HM surface interactions with specific EUV resist components are evaluated for open-source experimental resist formulations dissected into its individual additives using EUV contrast curves as an effective characterization method to determine post-development residue formation. Separately, an alternative adhesion promoter platform specifically tailored for a selected ultrathin inorganic HM based on amorphous silicon (aSi) is presented and the mitigation of resist delamination is exemplified for the cases of positive-tone and negative-tone development (PTD, NTD). Additionally, original wafer priming hardware for the deposition of such novel adhesion promoters is unveiled. The lessons learned in this work can be directly applied to the engineering of EUV resist materials and processes specifically designed to work on such novel HMs.

  12. Design, conception, and metrology of Extreme Ultraviolet multilayers mirrors resistant environments of space and EUV sources

    International Nuclear Information System (INIS)

    Hecquet, Ch.

    2009-03-01

    The Extreme Ultraviolet Spectrum (EUV) wavelengths, which range between 13 nm and 40 nm, have many applications in science and technology. These have been developed for example in plasma physics (high order harmonics sources, X ray lasers). The work presented is about the design, the fabrication and the metrology of periodic multilayer mirrors. The main motivation of this study is to establish a cycle of development taking into account both the optical properties of reflective coatings (reflectivity, spectral selectivity, attenuation) and their behaviour under various environments. To improve the spectral selectivity, new multilayer periodic structures have been developed. They are characterized by a bimodal reflectance profile with adjustable attenuation. The effect of environment on the stability of performance is especially critical for the optical collection. The addition of material barriers has stabilized the performance of the peak reflectivity for over 200 h at 400 C deg. and it reduces the influence of other factors of instability on the reflectance. In addition, all structures have been fabricated successfully and evaluated in severe environments. (author)

  13. SCRIC: a code dedicated to the detailed emission and absorption of heterogeneous NLTE plasmas; application to xenon EUV sources

    International Nuclear Information System (INIS)

    Gaufridy de Dortan, F. de

    2006-01-01

    Nearly all spectral opacity codes for LTE and NLTE plasmas rely on configurations approximate modelling or even supra-configurations modelling for mid Z plasmas. But in some cases, configurations interaction (either relativistic and non relativistic) induces dramatic changes in spectral shapes. We propose here a new detailed emissivity code with configuration mixing to allow for a realistic description of complex mid Z plasmas. A collisional radiative calculation. based on HULLAC precise energies and cross sections. determines the populations. Detailed emissivities and opacities are then calculated and radiative transfer equation is resolved for wide inhomogeneous plasmas. This code is able to cope rapidly with very large amount of atomic data. It is therefore possible to use complex hydrodynamic files even on personal computers in a very limited time. We used this code for comparison with Xenon EUV sources within the framework of nano-lithography developments. It appears that configurations mixing strongly shifts satellite lines and must be included in the description of these sources to enhance their efficiency. (author)

  14. Phosphorus-based compounds for EUV multilayer optics materials

    NARCIS (Netherlands)

    Medvedev, Viacheslav; Yakshin, Andrey; van de Kruijs, Robbert Wilhelmus Elisabeth; Bijkerk, Frederik

    2015-01-01

    We have evaluated the prospects of phosphorus-based compounds in extreme ultraviolet multilayer optics. Boron phosphide (BP) is suggested to be used as a spacer material in reflective multilayer optics operating just above the L-photoabsorption edge of P (λ ≈9.2 nm). Mo, Ag, Ru, Rh, and Pd were

  15. Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking

    Science.gov (United States)

    Manouras, Theodoros; Kazazis, Dimitrios; Koufakis, Eleftherios; Ekinci, Yasin; Vamvakaki, Maria; Argitis, Panagiotis

    2018-03-01

    The main target of the current work was to develop new sensitive polymeric materials for lithographic applications, focusing in particular to EUV lithography, the main chain of which is cleaved under the influence of photogenerated acid. Resist materials based on the cleavage of polymer main chain are in principle capable to create very small structures, to the dimensions of the monomers that they consist of. Nevertheless, in the case of the commonly used nonchemically amplified materials of this type issues like sensitivity and poor etch resistance limit their areas of application, whereas inadequate etch resistance and non- satisfactory process reliability are the usual problems encountered in acid catalysed materials based on main chain scission. In our material design the acid catalyzed chain cleavable polymers contain very sensitive moieties in their backbone while they remain intact in alkaline ambient. These newly synthesized polymers bear in addition suitable functional groups for the achievement of desirable lithographic characteristics (thermal stability, acceptable glass transition temperature, etch resistance, proper dissolution behavior, adhesion to the substrate). Our approach for achieving acceptable etch resistance, a main drawback in other main chain cleavable resists, is based on the introduction of polyaromatic hydrocarbons in the polymeric backbone, whereas the incorporation of an inorganic component further enhances the etch resistance. Single component systems can also be designed following the proposed approach by the incorporation of suitable PAGs and base quencher molecules in the main chain. Resist formulations based on a random copolymer designed according to the described rules evaluated in EUV exhibit ultrahigh sensitivity, capability for high resolution patterning and overall processing characteristics that make them strong candidates for industrial use upon further optimization.

  16. Modeling of EUV emission from xenon and tin plasma sources for nanolithography

    Energy Technology Data Exchange (ETDEWEB)

    Poirier, M. [Service Photons, Atomes, et Molecules, CEA Saclay, bat. 522, F91191 Gif/Yvette Cedex (France)]. E-mail: michel.poirier@cea.fr; Blenski, T. [Service Photons, Atomes, et Molecules, CEA Saclay, bat. 522, F91191 Gif/Yvette Cedex (France); Gaufridy de Dortan, F. de [Service Photons, Atomes, et Molecules, CEA Saclay, bat. 522, F91191 Gif/Yvette Cedex (France); Gilleron, F. [CEA-DAM, F91680 Bruyeres-le-Chatel (France)

    2006-05-15

    Over the last decade there has been a major effort devoted to the development of efficient extreme UV sources designed for nanolithography, operating in the 13.5-nm range. Possible sources include laser-produced plasmas and discharge-produced plasmas. This paper, devoted to the modeling of such emission, emphasizes the atomic physics effects and particularly the effects of configuration interaction. Two types of theoretical approaches are presented, one involving the detailed computation with the parametric potential code HULLAC, the other based on the superconfiguration code SCO. Computations of emission spectra in xenon and tin are presented. The possible influence of non-local thermodynamic equilibrium (NLTE) effects is investigated using populations given by the simple collisional-radiative formulas from Colombant and Tonon. Convergence to LTE is analyzed in the tin case.

  17. Design, conception, and metrology of Extreme Ultraviolet multilayers mirrors resistant environments of space and EUV sources; Conception, realisation et metrologie de miroirs multicouches pour l'extreme ultraviolet resistants aux environnements du spatial et des sources EUV

    Energy Technology Data Exchange (ETDEWEB)

    Hecquet, Ch.

    2009-03-15

    The Extreme Ultraviolet Spectrum (EUV) wavelengths, which range between 13 nm and 40 nm, have many applications in science and technology. These have been developed for example in plasma physics (high order harmonics sources, X ray lasers). The work presented is about the design, the fabrication and the metrology of periodic multilayer mirrors. The main motivation of this study is to establish a cycle of development taking into account both the optical properties of reflective coatings (reflectivity, spectral selectivity, attenuation) and their behaviour under various environments. To improve the spectral selectivity, new multilayer periodic structures have been developed. They are characterized by a bimodal reflectance profile with adjustable attenuation. The effect of environment on the stability of performance is especially critical for the optical collection. The addition of material barriers has stabilized the performance of the peak reflectivity for over 200 h at 400 C deg. and it reduces the influence of other factors of instability on the reflectance. In addition, all structures have been fabricated successfully and evaluated in severe environments. (author)

  18. Complex EUV imaging reflectometry: spatially resolved 3D composition determination and dopant profiling with a tabletop 13nm source

    Science.gov (United States)

    Porter, Christina L.; Tanksalvala, Michael; Gerrity, Michael; Miley, Galen P.; Esashi, Yuka; Horiguchi, Naoto; Zhang, Xiaoshi; Bevis, Charles S.; Karl, Robert; Johnsen, Peter; Adams, Daniel E.; Kapteyn, Henry C.; Murnane, Margaret M.

    2018-03-01

    With increasingly 3D devices becoming the norm, there is a growing need in the semiconductor industry and in materials science for high spatial resolution, non-destructive metrology techniques capable of determining depth-dependent composition information on devices. We present a solution to this problem using ptychographic coherent diffractive imaging (CDI) implemented using a commercially available, tabletop 13 nm source. We present the design, simulations, and preliminary results from our new complex EUV imaging reflectometer, which uses coherent 13 nm light produced by tabletop high harmonic generation. This tool is capable of determining spatially-resolved composition vs. depth profiles for samples by recording ptychographic images at multiple incidence angles. By harnessing phase measurements, we can locally and nondestructively determine quantities such as device and thin film layer thicknesses, surface roughness, interface quality, and dopant concentration profiles. Using this advanced imaging reflectometer, we can quantitatively characterize materials-sciencerelevant and industry-relevant nanostructures for a wide variety of applications, spanning from defect and overlay metrology to the development and optimization of nano-enhanced thermoelectric or spintronic devices.

  19. Atomic processes and equation of state of high Z plasmas for EUV sources and their effects on the spatial and temporal evolution of the plasmas

    Science.gov (United States)

    Sasaki, Akira; Sunahara, Atushi; Furukawa, Hiroyuki; Nishihara, Katsunobu; Nishikawa, Takeshi; Koike, Fumihiro

    2016-03-01

    Laser-produced plasma (LPP) extreme ultraviolet (EUV) light sources have been intensively investigated due to potential application to next-generation semiconductor technology. Current studies focus on the atomic processes and hydrodynamics of plasmas to develop shorter wavelength sources at λ = 6.x nm as well as to improve the conversion efficiency (CE) of λ = 13.5 nm sources. This paper examines the atomic processes of mid-z elements, which are potential candidates for λ = 6.x nm source using n=3-3 transitions. Furthermore, a method to calculate the hydrodynamics of the plasmas in terms of the initial interaction between a relatively weak prepulse laser is presented.

  20. Design and fabrication of advanced EUV diffractive elements

    Energy Technology Data Exchange (ETDEWEB)

    Naulleau, Patrick P.; Liddle, J. Alexander; Salmassi, Farhad; Anderson, Erik H.; Gullikson, Eric M.

    2003-11-16

    As extreme ultraviolet (EUV) lithography approaches commercial reality, the development of EUV-compatible diffractive structures becomes increasingly important. Such devices are relevant to many aspects of EUV technology including interferometry, illumination, and spectral filtering. Moreover, the current scarcity of high power EUV sources makes the optical efficiency of these diffractive structures a paramount concern. This fact has led to a strong interest in phase-enhanced diffractive structures. Here we describe recent advancements made in the fabrication of such devices.

  1. Imaging and Patterning on Nanometer Scale Using Coherent EUV Light

    International Nuclear Information System (INIS)

    Wachulak, P.W.; Fiedorowicz, H.; Bartnik, A.; Marconi, M.C.; Menoni, C.S.; Rocca, J.J.

    2010-01-01

    Extreme ultraviolet (EUV) covers wavelength range from about 5 nm to 50 nm. That is why EUV is especially applicable for imaging and patterning on nanometer scale length. In the paper periodic nanopatterning realized by interference lithography and high resolution holographic nanoimaging performed in a Gabor in-line scheme are presented. In the experiments a compact table top EUV laser was used. Preliminary studies on using a laser plasma EUV source for nanoimaging are presented as well. (author)

  2. Robust design of broadband EUV multilayer beam splitters based on particle swarm optimization

    International Nuclear Information System (INIS)

    Jiang, Hui; Michette, Alan G.

    2013-01-01

    A robust design idea for broadband EUV multilayer beam splitters is introduced that achieves the aim of decreasing the influence of layer thickness errors on optical performances. Such beam splitters can be used in interferometry to determine the quality of EUVL masks by comparing with a reference multilayer. In the optimization, particle swarm techniques were used for the first time in such designs. Compared to conventional genetic algorithms, particle swarm optimization has stronger ergodicity, simpler processing and faster convergence

  3. Diagnostic system for EUV radiation measurements from dense xenon plasma generated by MPC

    International Nuclear Information System (INIS)

    Petrov, Yu.V.; Garkusha, I.E.; Solyakov, D.G.; Marchenko, A.K.; Chebotarev, V.V.; Ladygina, M.S.; Staltsov, V.V.; Yelisyeyev, D.V.; Hassanein, A.

    2011-01-01

    Magnetoplasma compressor (MPC) of compact geometry has been designed and tested as a source of EUV radiation. In present paper diagnostic system for registration of EUV radiation is described. It was applied for radiation measurements in different operation modes of MPC. The registration system was designed on the base of combination of different types of AXUV photodiodes. Possibility to minimize the influence of electrons and ions flows from dense plasma stream on AXUV detector performance and results of the measurements has been discussed.

  4. Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography

    Science.gov (United States)

    Tasdemir, Zuhal; Mochi, Iacopo; Olvera, Karen Garrido; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Fallica, Roberto; Vockenhuber, Michaela; Ekinci, Yasin

    2017-10-01

    Extreme UV lithography (EUVL) has gained considerable attention for several decades as a potential technology for the semiconductor industry and it is now close to being adopted in high-volume manufacturing. At Paul Scherrer Institute (PSI), we have focused our attention on EUV resist performance issues by testing available high-performance EUV resists in the framework of a joint collaboration with ASML. For this purpose, we use the grating-based EUV-IL setup installed at the Swiss Light Source (SLS) at PSI, in which a coherent beam with 13.5 nm wavelength is used to produce a periodic aerial image with virtually 100% contrast and large depth of focus. Interference lithography is a relatively simple technique and it does not require many optical components, therefore the unintended flare is minimized and the aerial image is well-defined sinusoidal pattern. For the collaborative work between PSI and ASML, exposures are being performed on the EUV-IL exposure tool at PSI. For better quantitative comparison to the NXE scanner results, it is targeted to determine the actual NILS of the EUV-IL exposure tool at PSI. Ultimately, any resist-related metrology must be aligned and compared with the performance of EUV scanners. Moreover, EUV-IL is a powerful method for evaluating the resist performance and a resist which performs well with EUV-IL, shows, in general, also good performance with NXE scanners. However, a quantitative prediction of the performance based on EUV-IL measurements has not been possible due to the differences in aerial image formation. In this work, we aim to study the performance of EUV resists with different aerial images. For this purpose, after the real interference pattern exposure, we overlay a flat field exposure to emulate different levels of contrast. Finally, the results are compared with data obtained from EUV scanner. This study will enable not only match the data obtained from EUV- IL at PSI with the performance of NXE scanners, but also a

  5. FORMATION OF S-BEARING SPECIES BY VUV/EUV IRRADIATION OF H{sub 2}S-CONTAINING ICE MIXTURES: PHOTON ENERGY AND CARBON SOURCE EFFECTS

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Y.-J.; Juang, K.-J.; Qiu, J.-M.; Chu, C.-C.; Yih, T.-S. [Department of Physics, National Central University, Jhongli City, Taoyuan County 32054, Taiwan (China); Nuevo, M. [NASA Ames Research Center, Moffett Field, CA 94035 (United States); Jiménez-Escobar, A.; Muñoz Caro, G. M. [Centro de Astrobiología, INTA-CSIC, Torrejón de Ardoz, E-28850 Madrid (Spain); Wu, C.-Y. R. [Space Sciences Center and Department of Physics and Astronomy, University of Southern California, Los Angeles, CA 90089-1341 (United States); Fung, H.-S. [National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan (China); Ip, W.-H. [Graduate Institute of Astronomy, National Central University, Jhongli City, Taoyuan County 32049, Taiwan (China)

    2015-01-10

    Carbonyl sulfide (OCS) is a key molecule in astrobiology that acts as a catalyst in peptide synthesis by coupling amino acids. Experimental studies suggest that hydrogen sulfide (H{sub 2}S), a precursor of OCS, could be present in astrophysical environments. In the present study, we used a microwave-discharge hydrogen-flow lamp, simulating the interstellar UV field, and a monochromatic synchrotron light beam to irradiate CO:H{sub 2}S and CO{sub 2}:H{sub 2}S ice mixtures at 14 K with vacuum ultraviolet (VUV) or extreme ultraviolet (EUV) photons in order to study the effect of the photon energy and carbon source on the formation mechanisms and production yields of S-containing products (CS{sub 2}, OCS, SO{sub 2}, etc.). Results show that (1) the photo-induced OCS production efficiency in CO:H{sub 2}S ice mixtures is higher than that of CO{sub 2}:H{sub 2}S ice mixtures; (2) a lower concentration of H{sub 2}S enhances the production efficiency of OCS in both ice mixtures; and (3) the formation pathways of CS{sub 2} differ significantly upon VUV and EUV irradiations. Furthermore, CS{sub 2} was produced only after VUV photoprocessing of CO:H{sub 2}S ices, while the VUV-induced production of SO{sub 2} occurred only in CO{sub 2}:H{sub 2}S ice mixtures. More generally, the production yields of OCS, H{sub 2}S{sub 2}, and CS{sub 2} were studied as a function of the irradiation photon energy. Heavy S-bearing compounds were also observed using mass spectrometry during the warm-up of VUV/EUV-irradiated CO:H{sub 2}S ice mixtures. The presence of S-polymers in dust grains may account for the missing sulfur in dense clouds and circumstellar environments.

  6. FORMATION OF S-BEARING SPECIES BY VUV/EUV IRRADIATION OF H2S-CONTAINING ICE MIXTURES: PHOTON ENERGY AND CARBON SOURCE EFFECTS

    International Nuclear Information System (INIS)

    Chen, Y.-J.; Juang, K.-J.; Qiu, J.-M.; Chu, C.-C.; Yih, T.-S.; Nuevo, M.; Jiménez-Escobar, A.; Muñoz Caro, G. M.; Wu, C.-Y. R.; Fung, H.-S.; Ip, W.-H.

    2015-01-01

    Carbonyl sulfide (OCS) is a key molecule in astrobiology that acts as a catalyst in peptide synthesis by coupling amino acids. Experimental studies suggest that hydrogen sulfide (H 2 S), a precursor of OCS, could be present in astrophysical environments. In the present study, we used a microwave-discharge hydrogen-flow lamp, simulating the interstellar UV field, and a monochromatic synchrotron light beam to irradiate CO:H 2 S and CO 2 :H 2 S ice mixtures at 14 K with vacuum ultraviolet (VUV) or extreme ultraviolet (EUV) photons in order to study the effect of the photon energy and carbon source on the formation mechanisms and production yields of S-containing products (CS 2 , OCS, SO 2 , etc.). Results show that (1) the photo-induced OCS production efficiency in CO:H 2 S ice mixtures is higher than that of CO 2 :H 2 S ice mixtures; (2) a lower concentration of H 2 S enhances the production efficiency of OCS in both ice mixtures; and (3) the formation pathways of CS 2 differ significantly upon VUV and EUV irradiations. Furthermore, CS 2 was produced only after VUV photoprocessing of CO:H 2 S ices, while the VUV-induced production of SO 2 occurred only in CO 2 :H 2 S ice mixtures. More generally, the production yields of OCS, H 2 S 2 , and CS 2 were studied as a function of the irradiation photon energy. Heavy S-bearing compounds were also observed using mass spectrometry during the warm-up of VUV/EUV-irradiated CO:H 2 S ice mixtures. The presence of S-polymers in dust grains may account for the missing sulfur in dense clouds and circumstellar environments

  7. Development of amorphous silicon based EUV hardmasks through physical vapor deposition

    Science.gov (United States)

    De Silva, Anuja; Mignot, Yann; Meli, Luciana; DeVries, Scott; Xu, Yongan; Seshadri, Indira; Felix, Nelson M.; Zeng, Wilson; Cao, Yong; Phan, Khoi; Dai, Huixiong; Ngai, Christopher S.; Stolfi, Michael; Diehl, Daniel L.

    2017-10-01

    Extending extreme ultraviolet (EUV) single exposure patterning to its limits requires more than photoresist development. The hardmask film is a key contributor in the patterning stack that offers opportunities to enhance lithographic process window, increase pattern transfer efficiency, and decrease defectivity when utilizing very thin film stacks. This paper introduces the development of amorphous silicon (a-Si) deposited through physical vapor deposited (PVD) as an alternative to a silicon ARC (SiARC) or silicon-oxide-type EUV hardmasks in a typical trilayer patterning scheme. PVD offers benefits such as lower deposition temperature, and higher purity, compared to conventional chemical vapor deposition (CVD) techniques. In this work, sub-36nm pitch line-space features were resolved with a positive-tone organic chemically-amplified resist directly patterned on PVD a-Si, without an adhesion promotion layer and without pattern collapse. Pattern transfer into the underlying hardmask stack was demonstrated, allowing an evaluation of patterning metrics related to resolution, pattern transfer fidelity, and film defectivity for PVD a-Si compared to a conventional tri-layer patterning scheme. Etch selectivity and the scalability of PVD a-Si to reduce the aspect ratio of the patterning stack will also be discussed.

  8. Evaluating EUV mask pattern imaging with two EUV microscopes

    International Nuclear Information System (INIS)

    Goldberg, Kenneth A.; Takase, Kei; Naulleau, Patrick P.; Han, Hakseung; Barty, Anton; Kinoshita, Hiroo; Hamamoto, Kazuhiro

    2008-01-01

    Aerial image measurement plays a key role in the development of patterned reticles for each generation of lithography. Studying the field transmitted (reflected) from EUV masks provides detailed information about potential disruptions caused by mask defects, and the performance of defect repair strategies, without the complications of photoresist imaging. Furthermore, by measuring the continuously varying intensity distribution instead of a thresholded, binary resist image, aerial image measurement can be used as feedback to improve mask and lithography system modeling methods. Interest in EUV, at-wavelength, aerial image measurement lead to the creation of several research tools worldwide. These tools are used in advanced mask development work, and in the evaluation of the need for commercial at-wavelength inspection tools. They describe performance measurements of two such tools, inspecting the same EUV mask in a series of benchmarking tests that includes brightfield and darkfield patterns. One tool is the SEMATECH Berkeley Actinic Inspection Tool (AIT) operating on a bending magnet beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. The AIT features an EUV Fresnel zoneplate microscope that emulates the numerical aperture of a 0.25-NA stepper, and projects the aerial image directly onto a CCD camera, with 700x magnification. The second tool is an EUV microscope (EUVM) operating at the NewSUBARU synchrotron in Hyogo, Japan. The NewSUBARU tool projects the aerial image using a reflective, 30x Schwarzschild objective lens, followed by a 10-200x x-ray zooming tube. The illumination conditions and the imaging etendue are different for the two tools. The benchmarking measurements were used to determine many imaging and performance properties of the tools, including resolution, modulation transfer function (MTF), aberration magnitude, aberration field-dependence (including focal-plane tilt), illumination uniformity, line-edge roughness, and flare

  9. EUV multilayer mirrors with enhanced stability

    Science.gov (United States)

    Benoit, Nicolas; Yulin, Sergiy; Feigl, Torsten; Kaiser, Norbert

    2006-08-01

    The application of multilayer optics in EUV lithography requires not only the highest possible normal-incidence reflectivity but also a long-term thermal and radiation stability at operating temperatures. This requirement is most important in the case of the collector mirror of the illumination system close to the EUV source where a short-time decrease in reflectivity is most likely. Mo/Si multilayer mirrors, designed for high normal reflectivity at the wavelength of 13.5 nm and deposited by dc magnetron sputtering, were directly exposed to EUV radiation without mitigation system. They presented a loss of reflectivity of more than 18% after only 8 hours of irradiation by a Xe-discharge source. Another problem of Mo/Si multilayers is the instability of reflectivity and peak wavelength under high heat load. It becomes especially critical at temperatures above 200°C, where interdiffusion between the molybdenum and the silicon layers is observed. The development of high-temperature multilayers was focused on two alternative Si-based systems: MoSi II/Si and interface engineered Mo/C/Si/C multilayer mirrors. The multilayer designs as well as the deposition parameters of all systems were optimized in terms of high peak reflectivity (>= 60 %) at a wavelength of 13.5 nm and high thermal stability. Small thermally induced changes of the MoSi II/Si multilayer properties were found but they were independent of the annealing time at all temperatures examined. A wavelength shift of -1.7% and a reflectivity drop of 1.0% have been found after annealing at 500°C for 100 hours. The total degradation of optical properties above 650°C can be explained by a recrystallization process of MoSi II layers.

  10. EUVS Sounding Rocket Payload

    Science.gov (United States)

    Stern, Alan S.

    1996-01-01

    During the first half of this year (CY 1996), the EUVS project began preparations of the EUVS payload for the upcoming NASA sounding rocket flight 36.148CL, slated for launch on July 26, 1996 to observe and record a high-resolution (approx. 2 A FWHM) EUV spectrum of the planet Venus. These preparations were designed to improve the spectral resolution and sensitivity performance of the EUVS payload as well as prepare the payload for this upcoming mission. The following is a list of the EUVS project activities that have taken place since the beginning of this CY: (1) Applied a fresh, new SiC optical coating to our existing 2400 groove/mm grating to boost its reflectivity; (2) modified the Ranicon science detector to boost its detective quantum efficiency with the addition of a repeller grid; (3) constructed a new entrance slit plane to achieve 2 A FWHM spectral resolution; (4) prepared and held the Payload Initiation Conference (PIC) with the assigned NASA support team from Wallops Island for the upcoming 36.148CL flight (PIC held on March 8, 1996; see Attachment A); (5) began wavelength calibration activities of EUVS in the laboratory; (6) made arrangements for travel to WSMR to begin integration activities in preparation for the July 1996 launch; (7) paper detailing our previous EUVS Venus mission (NASA flight 36.117CL) published in Icarus (see Attachment B); and (8) continued data analysis of the previous EUVS mission 36.137CL (Spica occultation flight).

  11. High Quality, Low-Scatter SiC Optics Suitable for Space-based UV & EUV Applications, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — SSG Precision Optronics proposes the development and demonstration of a new optical fabrication process for the production of EUV quality Silicon Carbide (SiC)...

  12. Performance improvement of two-dimensional EUV spectroscopy based on high frame rate CCD and signal normalization method

    International Nuclear Information System (INIS)

    Zhang, H.M.; Morita, S.; Ohishi, T.; Goto, M.; Huang, X.L.

    2014-01-01

    In the Large Helical Device (LHD), the performance of two-dimensional (2-D) extreme ultraviolet (EUV) spectroscopy with wavelength range of 30-650A has been improved by installing a high frame rate CCD and applying a signal intensity normalization method. With upgraded 2-D space-resolved EUV spectrometer, measurement of 2-D impurity emission profiles with high horizontal resolution is possible in high-density NBI discharges. The variation in intensities of EUV emission among a few discharges is significantly reduced by normalizing the signal to the spectral intensity from EUV_—Long spectrometer which works as an impurity monitor with high-time resolution. As a result, high resolution 2-D intensity distribution has been obtained from CIV (384.176A), CV(2x40.27A), CVI(2x33.73A) and HeII(303.78A). (author)

  13. EUV and Magnetic Activities Associated with Type-I Solar Radio Bursts

    Science.gov (United States)

    Li, C. Y.; Chen, Y.; Wang, B.; Ruan, G. P.; Feng, S. W.; Du, G. H.; Kong, X. L.

    2017-06-01

    Type-I bursts ( i.e. noise storms) are the earliest-known type of solar radio emission at the meter wavelength. They are believed to be excited by non-thermal energetic electrons accelerated in the corona. The underlying dynamic process and exact emission mechanism still remain unresolved. Here, with a combined analysis of extreme ultraviolet (EUV), radio and photospheric magnetic field data of unprecedented quality recorded during a type-I storm on 30 July 2011, we identify a good correlation between the radio bursts and the co-spatial EUV and magnetic activities. The EUV activities manifest themselves as three major brightening stripes above a region adjacent to a compact sunspot, while the magnetic field there presents multiple moving magnetic features (MMFs) with persistent coalescence or cancelation and a morphologically similar three-part distribution. We find that the type-I intensities are correlated with those of the EUV emissions at various wavelengths with a correlation coefficient of 0.7 - 0.8. In addition, in the region between the brightening EUV stripes and the radio sources there appear consistent dynamic motions with a series of bi-directional flows, suggesting ongoing small-scale reconnection there. Mainly based on the induced connection between the magnetic motion at the photosphere and the EUV and radio activities in the corona, we suggest that the observed type-I noise storms and the EUV brightening activities are the consequence of small-scale magnetic reconnection driven by MMFs. This is in support of the original proposal made by Bentley et al. ( Solar Phys. 193, 227, 2000).

  14. Ionospheric Change and Solar EUV Irradiance

    Science.gov (United States)

    Sojka, J. J.; David, M.; Jensen, J. B.; Schunk, R. W.

    2011-12-01

    The ionosphere has been quantitatively monitored for the past six solar cycles. The past few years of observations are showing trends that differ from the prior cycles! Our good statistical relationships between the solar radio flux index at 10.7 cm, the solar EUV Irradiance, and the ionospheric F-layer peak density are showing indications of divergence! Present day discussion of the Sun-Earth entering a Dalton Minimum would suggest change is occurring in the Sun, as the driver, followed by the Earth, as the receptor. The dayside ionosphere is driven by the solar EUV Irradiance. But different components of this spectrum affect the ionospheric layers differently. For a first time the continuous high cadence EUV spectra from the SDO EVE instrument enable ionospheric scientists the opportunity to evaluate solar EUV variability as a driver of ionospheric variability. A definitive understanding of which spectral components are responsible for the E- and F-layers of the ionosphere will enable assessments of how over 50 years of ionospheric observations, the solar EUV Irradiance has changed. If indeed the evidence suggesting the Sun-Earth system is entering a Dalton Minimum periods is correct, then the comprehensive EVE solar EUV Irradiance data base combined with the ongoing ionospheric data bases will provide a most fortuitous fiduciary reference baseline for Sun-Earth dependencies. Using the EVE EUV Irradiances, a physics based ionospheric model (TDIM), and 50 plus years of ionospheric observation from Wallops Island (Virginia) the above Sun-Earth ionospheric relationship will be reported on.

  15. Characterization of laser-produced plasma EUV light

    International Nuclear Information System (INIS)

    Mizoguchi, Hakaru; Endo, Akira; Takabayashi, Yuichi; Sasaki, Akira; Komori, Hiroshi; Suganuma, Takashi

    2005-01-01

    Resolution of optical microlithography process becomes smaller and smaller. Wavelength of the light source for these optical lithography reduced from KrF, ArF to F2 to meet the resolution requirement. Recently EUV is spotlighted as promising candidate for next generation lithography light source. This paper summarizes the requirement and studies of experiments and simulation to improve the convention efficiency of EUV light source. (author)

  16. Oxide Nanoparticle EUV (ONE) Photoresists: Current Understanding of the Unusual Patterning Mechanism

    KAUST Repository

    Jiang, Jing; Zhang, Ben; Yu, Mufei; Li, Li; Neisser, Mark; Sung Chun, Jun; Giannelis, Emmanuel P.; Ober, Christopher K.

    2015-01-01

    © 2015 SPST. In the past few years, industry has made significant progress to deliver a stable high power EUV scanner and a 100 W light source is now being tested on the manufacuring scale. The success of a high power EUV source demands a fast and high resolution EUV resist. However, chemcially amplied resists encounter unprecedented challenges beyond the 22 nm node due to resolution, roughness and sensitivity tradeoffs. Unless novel solutions for EUV resists are proposed and further optimzed, breakthroughs can hardly be achieved. Oxide nanoparticle EUV (ONE) resists stablized by organic ligands were originally proposed by Ober et al. Recently this work attracts more and more attention due to its extraordinanry EUV sensitivity. This new class of photoresist utilizes ligand cleavage with a ligand exchange mechanism to switch its solubilty for dual-tone patterning. Therefore, ligand selection of the nanoparticles is extremely important to its EUV performance.

  17. Absorption and Emission of EUV Radiation by the Local ISM

    Science.gov (United States)

    Paresce, F.

    1984-01-01

    The Berkeley extreme ultraviolet radiation (EUV) telescope flown on the Apollo Soyuz mission in July, 1975 established the existence of a measurable flux of EUV (100 lambda or = or = 1000 A) originating from sources outside the solar system. White dwarfs, flare stars and cataclysmic variables were dicovered to be relatively intense compact sources of EUV photons. Moreover, this and other subsequent experiments have strongly suggested the presence of a truly diffuse component of the FUV radiation field possibly due to thermal emission from hot interstellar gas located in the general vicinity of the Sun. Closer to the H1, 912 A edge, the effect of a few hot O and B stars has been shown to be very important in establishing the interstellar flux density. All these results imply that the local interstellar medium (ISM) is immersed in a non-negligible EUV radiation field which, because of the strong coupling between EUV photons and matter, will play a crucial role in determining its physical structure. The available information on the local ISM derived from the limited EUV observations carried out so far is assembled and analyzed. These include measurements of the spectra of bright EUV sources that reveal clear evidence of H photo absorption at lambda 400 A and of the He ionization edge at 228 A.

  18. EUV laser produced and induced plasmas for nanolithography

    Science.gov (United States)

    Sizyuk, Tatyana; Hassanein, Ahmed

    2017-10-01

    EUV produced plasma sources are being extensively studied for the development of new technology for computer chips production. Challenging tasks include optimization of EUV source efficiency, producing powerful source in 2 percentage bandwidth around 13.5 nm for high volume manufacture (HVM), and increasing the lifetime of collecting optics. Mass-limited targets, such as small droplet, allow to reduce contamination of chamber environment and mirror surface damage. However, reducing droplet size limits EUV power output. Our analysis showed the requirement for the target parameters and chamber conditions to achieve 500 W EUV output for HVM. The HEIGHTS package was used for the simulations of laser produced plasma evolution starting from laser interaction with solid target, development and expansion of vapor/plasma plume with accurate optical data calculation, especially in narrow EUV region. Detailed 3D modeling of mix environment including evolution and interplay of plasma produced by lasers from Sn target and plasma produced by in-band and out-of-band EUV radiation in ambient gas, used for the collecting optics protection and cleaning, allowed predicting conditions in entire LPP system. Effect of these conditions on EUV photon absorption and collection was analyzed. This work is supported by the National Science Foundation, PIRE project.

  19. Relationship between resist outgassing and EUV witness sample contamination in NXE outgas qualification using electrons and EUV photons

    Science.gov (United States)

    Pollentier, I.; Tirumala Venkata, A.; Gronheid, R.

    2014-04-01

    EUV photoresists are considered as a potential source of optics contamination, since they introduce irradiation-induced outgassing in the EUV vacuum environment. Therefore, before these resists can be used on e.g. ASML NXE:3100 or NXE:3300, they need to be tested in dedicated equipment according to a well-defined procedure, which is based on exposing a witness sample (WS) in the vicinity of a simultaneously exposed resist as it outgasses. Different system infrastructures are used at multiple sites (e.g. NIST, CNSE, Sematech, EIDEC, and imec) and were calibrated to each other by a detailed test plan. Despite this detailed tool qualifications, a first round robin comparison of identical materials showed inconsistent outgas test results, and required further investigation by a second round robin. Since the resist exposure mode is different at the various locations (some sites are using EUV photons while others use E-gun electrons), this difference has always a point of concern for variability of test results. In this work we compare the outgas test results from EUV photon and electron exposure using the resist materials of the second round robin. Since the imec outgas tester allows both exposure methods on the resist, a within-system comparison is possible and showed limited variation between photon and electron exposure mode. Therefore the system-to-system variability amongst the different outgas test sites is expected to be related to other parameters than the electron/photon exposure mode. Initial work showed that the variability might be related to temperature, E-gun emission excursion, and/or residual outgassing scaled by different wafer areas at the different sites.

  20. Laser-produced plasma-extreme ultraviolet light source for next generation lithography

    International Nuclear Information System (INIS)

    Nishihara, Katsunobu; Nishimura, Hiroaki; Gamada, Kouhei; Murakami, Masakatsu; Mochizuki, Takayasu; Sasaki, Akira; Sunahara, Atsushi

    2005-01-01

    Extreme ultraviolet (EUV) lithography is the most promising candidate for the next generation lithography for the 45 nm technology node and below. EUV light sources under consideration use 13.5 nm radiations from multicharged xenon, tin and lithium ions, because Mo/Si multiplayer mirrors have high reflectivity at this wavelength. A review of laser-produced plasma (LPP) EUV light sources is presented with a focus on theoretical and experimental studies under the auspices of the Leading Project promoted by MEXT. We discuss three theoretical topics: atomic processes in the LPP-EUV light source, conversion efficiency from laser light to EUV light at 13.5 nm wave-length with 2% bound width, and fast ion spectra. The properties of EUV emission from tin and xenon plasmas are also shown based on experimental results. (author)

  1. Mask-induced aberration in EUV lithography

    Science.gov (United States)

    Nakajima, Yumi; Sato, Takashi; Inanami, Ryoichi; Nakasugi, Tetsuro; Higashiki, Tatsuhiko

    2009-04-01

    We estimated aberrations using Zernike sensitivity analysis. We found the difference of the tolerated aberration with line direction for illumination. The tolerated aberration of perpendicular line for illumination is much smaller than that of parallel line. We consider this difference to be attributable to the mask 3D effect. We call it mask-induced aberration. In the case of the perpendicular line for illumination, there was a difference in CD between right line and left line without aberration. In this report, we discuss the possibility of pattern formation in NA 0.25 generation EUV lithography tool. In perpendicular pattern for EUV light, the dominant part of aberration is mask-induced aberration. In EUV lithography, pattern correction based on the mask topography effect will be more important.

  2. Metal Oxide Nanoparticle Photoresists for EUV Patterning

    KAUST Repository

    Jiang, Jing

    2014-01-01

    © 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have achieved high resolution (∼22 nm) at a very high EUV sensitivity (4.2 mJ/cm2). Further investigations into the patterning process suggests a ligand displacement mechanism, wherein, any combination of a metal oxide with the correct ligand could generate patterns in the presence of the suitable photoactive compound. The current investigation extends this study by developing new nanoparticle compositions with transdimethylacrylic acid and o-toluic acid ligands. This study describes their synthesis and patterning performance under 248 nm KrF laser (DUV) and also under 13.5 nm EUV exposures (dimethylacrylate nanoparticles) for the new resist compositions.

  3. Emission spectra of photoionized plasmas induced by intense EUV pulses: Experimental and theoretical investigations

    Science.gov (United States)

    Saber, Ismail; Bartnik, Andrzej; Skrzeczanowski, Wojciech; Wachulak, Przemysław; Jarocki, Roman; Fiedorowicz, Henryk

    2017-03-01

    Experimental measurements and numerical modeling of emission spectra in photoionized plasma in the ultraviolet and visible light (UV/Vis) range for noble gases have been investigated. The photoionized plasmas were created using laser-produced plasma (LPP) extreme ultraviolet (EUV) source. The source was based on a gas puff target; irradiated with 10ns/10J/10Hz Nd:YAG laser. The EUV radiation pulses were collected and focused using grazing incidence multifoil EUV collector. The laser pulses were focused on a gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Irradiation of gases resulted in a formation of low temperature photoionized plasmas emitting radiation in the UV/Vis spectral range. Atomic photoionized plasmas produced this way consisted of atomic and ionic with various ionization states. The most dominated observed spectral lines originated from radiative transitions in singly charged ions. To assist in a theoretical interpretation of the measured spectra, an atomic code based on Cowan's programs and a collisional-radiative PrismSPECT code have been used to calculate the theoretical spectra. A comparison of the calculated spectral lines with experimentally obtained results is presented. Electron temperature in plasma is estimated using the Boltzmann plot method, by an assumption that a local thermodynamic equilibrium (LTE) condition in the plasma is validated in the first few ionization states. A brief discussion for the measured and computed spectra is given.

  4. Surface roughness control by extreme ultraviolet (EUV) radiation

    Science.gov (United States)

    Ahad, Inam Ul; Obeidi, Muhannad Ahmed; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Brabazon, Dermot

    2017-10-01

    Surface roughness control of polymeric materials is often desirable in various biomedical engineering applications related to biocompatibility control, separation science and surface wettability control. In this study, Polyethylene terephthalate (PET) polymer films were irradiated with Extreme ultraviolet (EUV) photons in nitrogen environment and investigations were performed on surface roughness modification via EUV exposure. The samples were irradiated at 3 mm and 4 mm distance from the focal spot to investigate the effect of EUV fluence on topography. The topography of the EUV treated PET samples were studied by AFM. The detailed scanning was also performed on the sample irradiated at 3 mm. It was observed that the average surface roughness of PET samples was increased from 9 nm (pristine sample) to 280 nm and 253 nm for EUV irradiated samples. Detailed AFM studies confirmed the presence of 1.8 mm wide period U-shaped channels in EUV exposed PET samples. The walls of the channels were having FWHM of about 0.4 mm. The channels were created due to translatory movements of the sample in horizontal and transverse directions during the EUV exposure. The increased surface roughness is useful for many applications. The nanoscale channels fabricated by EUV exposure could be interesting for microfluidic applications based on lab-on-a-chip (LOC) devices.

  5. e-beam induced EUV photomask repair: a perfect match

    Science.gov (United States)

    Waiblinger, M.; Kornilov, K.; Hofmann, T.; Edinger, K.

    2010-05-01

    Due to the updated ITRS roadmap EUV might enter the market as a productive solution for the 32 nm node1. Since the EUV-photomask is used as mirror and no longer as transitive device the severity of different defect types has changed significantly. Furthermore the EUV-photomask material stack is much more complex than the conventional 193nm photomask materials which expand the field of critical defect types even further. In this paper we will show, that "classical" 193 mask repair processes cannot be applied to EUV material. We will show the performance of a new repair process based on the novel ebeam repair tool MeRiT® HR 32. Furthermore this process will be applied on real EUV mask defects and the success of these repairs confirmed by wafer prints.

  6. Coronal magnetic fields inferred from IR wavelength and comparison with EUV observations

    Directory of Open Access Journals (Sweden)

    Y. Liu

    2009-07-01

    Full Text Available Spectropolarimetry using IR wavelength of 1075 nm has been proved to be a powerful tool for directly mapping solar coronal magnetic fields including transverse component directions and line-of-sight component intensities. Solar tomography, or stereoscopy based on EUV observations, can supply 3-D information for some magnetic field lines in bright EUV loops. In a previous paper \\citep{liu08} the locations of the IR emission sources in the 3-D coordinate system were inferred from the comparison between the polarization data and the potential-field-source-surface (PFSS model, for one of five west limb regions in the corona (Lin et al., 2004. The paper shows that the region with the loop system in the active region over the photospheric area with strong magnetic field intensity is the region with a dominant contribution to the observed Stokes signals. So, the inversion of the measured Stokes parameters could be done assuming that most of the signals come from a relatively thin layer over the area with a large photospheric magnetic field strength. Here, the five limb coronal regions are studied together in order to study the spatial correlation between the bright EUV loop features and the inferred IR emission sources. It is found that, for the coronal regions above the stronger photospheric magnetic fields, the locations of the IR emission sources are closer to or more consistent with the bright EUV loop locations than those above weaker photospheric fields. This result suggests that the structures of the coronal magnetic fields observed at IR and EUV wavelengths may be different when weak magnetic fields present there.

  7. New type of discharge-produced plasma source for extreme ultraviolet based on liquid tin jet electrodes

    NARCIS (Netherlands)

    Koshelev, K.N.; Krivtsun, V.M.; Ivanov, V.; Yakushev, O.; Chekmarev, A.; Koloshnikov, V.; Snegirev, E.; Medvedev, Viacheslav

    2012-01-01

    A new approach for discharge-produced plasma (DPP) extreme ultraviolet (EUV) sources based on the usage of two liquid metallic alloy jets as discharge electrodes has been proposed and tested. Discharge was ignited using laser ablation of one of the cathode jets. A system with two jet electrodes was

  8. Metal Oxide Nanoparticle Photoresists for EUV Patterning

    KAUST Repository

    Jiang, Jing; Chakrabarty, Souvik; Yu, Mufei; Ober, Christopher K.

    2014-01-01

    © 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have

  9. Analysis and characterization of contamination in EUV reticles

    Science.gov (United States)

    Okoroanyanwu, Uzodinma; Dittmar, Kornelia; Fahr, Torsten; Wallow, Tom; La Fontaine, Bruno; Wood, Obert; Holfeld, Christian; Bubke, Karsten; Peters, Jan-Hendrik

    2010-04-01

    A host of complementary imaging techniques (Scanning Electron Microscopy), surface analytical technique (Auger Electron Spectroscopy, AES), chemical analytical and speciation techniques (Grazing Incidence Reflectance Fourier-Transform Infrared Spectroscopy, GIR-FTIR; and Raman spectroscopy) have been assessed for their sensitivity and effectiveness in analyzing contamination on three EUV reticles that were contaminated to varying degrees. The first reticle was contaminated as a result of its exposure experience on the SEMATECH EUV Micro Exposure Tool (MET) at Lawrence Berkeley National Laboratories, where it was exposed to up to 80 hours of EUV radiation. The second reticle was a full-field reticle, specifically designed to monitor molecular contamination, and exposed to greater than 1600J/cm2 of EUV radiation on the ASML Alpha Demo Tool (ADT) in Albany Nanotech in New York. The third reticle was intentionally contaminated with hydrocarbons in the Microscope for Mask Imaging and Contamination Studies (MIMICS) tool at the College of Nanoscale Sciences of State University of New York at Albany. The EUV reflectivities of some of these reticles were measured on the Advanced Light Source EUV Reflectomer at Lawrence Berkeley National Laboratories and PTB Bessy in Berlin, respectively. Analysis and characterization of thin film contaminants on the two EUV reticles exposed to varying degrees of EUV radiation in both MET and ADT confirm that the two most common contamination types are carbonization and surface oxidation, mostly on the exposed areas of the reticle, and with the MET being significantly more susceptible to carbon contamination than the ADT. While AES in both surface scanning and sputter mode is sensitive and efficient in analyzing thin contaminant films (of a few nanometers), GIRFTIR is sensitive to thick films (of order of a 100 nm or more on non-infra-red reflecting substrates), Raman spectroscopy is not compatible with analyzing such contaminants because of

  10. Response of inorganic materials to laser - plasma EUV radiation focused with a lobster eye collector

    Science.gov (United States)

    Bartnik, Andrzej; Fiedorowicz, Henryk; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Miroslaw; Havlikova, Radka; Pína, Ladislav; Švéda, Libor; Inneman, Adolf

    2007-05-01

    A single photon of EUV radiation carries enough energy to break any chemical bond or excite electrons from inner atomic shells. It means that the radiation regardless of its intensity can modify chemical structure of molecules. It is the reason that the radiation even with low intensity can cause fragmentation of long chains of organic materials and desorption of small parts from their surface. In this work interaction of EUV radiation with inorganic materials was investigated. Different inorganic samples were irradiated with a 10 Hz laser - plasma EUV source based on a gas puff target. The radiation was focused on a sample surface using a lobster eye collector. Radiation fluence at the surface reached 30 mJ/cm2 within a wavelength range 7 - 20 nm. In most cases there was no surface damage even after several minutes of irradiation. In some cases there could be noticed discolouration of an irradiated surface or evidences of thermal effects. In most cases however luminescent and scattered radiation was observed. The luminescent radiation was emitted in different wavelength ranges. It was recorded in a visible range of radiation and also in a wide wavelength range including UV, VUV and EUV. The radiation was especially intense in a case of non-metallic chemical compounds.

  11. EPE fundamentals and impact of EUV: Will traditional design-rule calculations work in the era of EUV?

    Science.gov (United States)

    Gabor, Allen H.; Brendler, Andrew C.; Brunner, Timothy A.; Chen, Xuemei; Culp, James A.; Levinson, Harry J.

    2018-03-01

    The relationship between edge placement error, semiconductor design-rule determination and predicted yield in the era of EUV lithography is examined. This paper starts with the basics of edge placement error and then builds up to design-rule calculations. We show that edge placement error (EPE) definitions can be used as the building blocks for design-rule equations but that in the last several years the term "EPE" has been used in the literature to refer to many patterning errors that are not EPE. We then explore the concept of "Good Fields"1 and use it predict the n-sigma value needed for design-rule determination. Specifically, fundamental yield calculations based on the failure opportunities per chip are used to determine at what n-sigma "value" design-rules need to be tested to ensure high yield. The "value" can be a space between two features, an intersect area between two features, a minimum area of a feature, etc. It is shown that across chip variation of design-rule important values needs to be tested at sigma values between seven and eight which is much higher than the four-sigma values traditionally used for design-rule determination. After recommending new statistics be used for design-rule calculations the paper examines the impact of EUV lithography on sources of variation important for design-rule calculations. We show that stochastics can be treated as an effective dose variation that is fully sampled across every chip. Combining the increased within chip variation from EUV with the understanding that across chip variation of design-rule important values needs to not cause a yield loss at significantly higher sigma values than have traditionally been looked at, the conclusion is reached that across-wafer, wafer-to-wafer and lot-to-lot variation will have to overscale for any technology introducing EUV lithography where stochastic noise is a significant fraction of the effective dose variation. We will emphasize stochastic effects on edge placement

  12. Atomic hydrogen cleaning of EUV multilayer optics

    Science.gov (United States)

    Graham, Samuel, Jr.; Steinhaus, Charles A.; Clift, W. Miles; Klebanoff, Leonard E.; Bajt, Sasa

    2003-06-01

    Recent studies have been conducted to investigate the use of atomic hydrogen as an in-situ contamination removal method for EUV optics. In these experiments, a commercial source was used to produce atomic hydrogen by thermal dissociation of molecular hydrogen using a hot filament. Samples for these experiments consisted of silicon wafers coated with sputtered carbon, Mo/Si optics with EUV-induced carbon, and bare Si-capped and Ru-B4C-capped Mo/Si optics. Samples were exposed to an atomic hydrogen source at a distance of 200 - 500 mm downstream and angles between 0-90° with respect to the source. Carbon removal rates and optic oxidation rates were measured using Auger electron spectroscopy depth profiling. In addition, at-wavelength peak reflectance (13.4 nm) was measured using the EUV reflectometer at the Advanced Light Source. Data from these experiments show carbon removal rates up to 20 Å/hr for sputtered carbon and 40 Å/hr for EUV deposited carbon at a distance of 200 mm downstream. The cleaning rate was also observed to be a strong function of distance and angular position. Experiments have also shown that the carbon etch rate can be increased by a factor of 4 by channeling atomic hydrogen through quartz tubes in order to direct the atomic hydrogen to the optic surface. Atomic hydrogen exposures of bare optic samples show a small risk in reflectivity degradation after extended periods. Extended exposures (up to 20 hours) of bare Si-capped Mo/Si optics show a 1.2% loss (absolute) in reflectivity while the Ru-B4C-capped Mo/Si optics show a loss on the order of 0.5%. In order to investigate the source of this reflectivity degradation, optic samples were exposed to atomic deuterium and analyzed using low energy ion scattering direct recoil spectroscopy to determine any reactions of the hydrogen with the multilayer stack. Overall, the results show that the risk of over-etching with atomic hydrogen is much less than previous studies using RF discharge cleaning

  13. ILT optimization of EUV masks for sub-7nm lithography

    Science.gov (United States)

    Hooker, Kevin; Kuechler, Bernd; Kazarian, Aram; Xiao, Guangming; Lucas, Kevin

    2017-06-01

    The 5nm and 7nm technology nodes will continue recent scaling trends and will deliver significantly smaller minimum features, standard cell areas and SRAM cell areas vs. the 10nm node. There are tremendous economic pressures to shrink each subsequent technology, though in a cost-effective and performance enhancing manner. IC manufacturers are eagerly awaiting EUV so that they can more aggressively shrink their technology than they could by using complicated MPT. The current 0.33NA EUV tools and processes also have their patterning limitations. EUV scanner lenses, scanner sources, masks and resists are all relatively immature compared to the current lithography manufacturing baseline of 193i. For example, lens aberrations are currently several times larger (as a function of wavelength) in EUV scanners than for 193i scanners. Robustly patterning 16nm L/S fully random logic metal patterns and 40nm pitch random logic rectangular contacts with 0.33NA EUV are tough challenges that will benefit from advanced OPC/RET. For example, if an IC manufacturer can push single exposure device layer resolution 10% tighter using improved ILT to avoid using DPT, there will be a significant cost and process complexity benefit to doing so. ILT is well known to have considerable benefits in finding flexible 193i mask pattern solutions to improve process window, improve 2D CD control, improve resolution in low K1 lithography regime and help to delay the introduction of DPT. However, ILT has not previously been applied to EUV lithography. In this paper, we report on new developments which extend ILT method to EUV lithography and we characterize the benefits seen vs. traditional EUV OPC/RET methods.

  14. Development of a EUV Test Facility at the Marshall Space Flight Center

    Science.gov (United States)

    West, Edward; Pavelitz, Steve; Kobayashi, Ken; Robinson, Brian; Cirtain, Johnathan; Gaskin, Jessica; Winebarger, Amy

    2011-01-01

    This paper will describe a new EUV test facility that is being developed at the Marshall Space Flight Center (MSFC) to test EUV telescopes. Two flight programs, HiC - high resolution coronal imager (sounding rocket) and SUVI - Solar Ultraviolet Imager (GOES-R), set the requirements for this new facility. This paper will discuss those requirements, the EUV source characteristics, the wavelength resolution that is expected and the vacuum chambers (Stray Light Facility, Xray Calibration Facility and the EUV test chamber) where this facility will be used.

  15. Radiometry for the EUV lithography; Radiometrie fuer die EUV-Lithographie

    Energy Technology Data Exchange (ETDEWEB)

    Scholze, Frank [Physikalisch-Technische Bundesanstalt (PTB), Berlin (Germany). Arbeitsgruppe ' EUV-Radiometrie' ; Laubis, Christian; Barboutis, Annett; Buchholz, Christian; Fischer, Andreas; Puls, Jana; Stadelhoff, Christian

    2014-12-15

    The EUV reflectrometry at the PTB storage BESSY I and BESSY II is described. Results on the reflectivities of some EUV mirrors are presented. Finally the spectral sensitivities of different photodiodes used as EUV detectors are presented. (HSI)

  16. Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments

    NARCIS (Netherlands)

    Wetering, van de F.M.J.H.; Nijdam, S.; Kroesen, G.M.W.

    2012-01-01

    In extreme ultraviolet (EUV) lithography, ionic and particulate debris coming from the plasma source plays an important role. We started up a project looking at the principles of particle formation in plasmas and the interaction with EUV radiation. To this end, we study a low-pressure (10 Pa)

  17. EUV tools: hydrogen gas purification and recovery strategies

    Science.gov (United States)

    Landoni, Cristian; Succi, Marco; Applegarth, Chuck; Riddle Vogt, Sarah

    2015-03-01

    The technological challenges that have been overcome to make extreme ultraviolet lithography (EUV) a reality have been enormous1. This vacuum driven technology poses significant purity challenges for the gases employed for purging and cleaning the scanner EUV chamber and source. Hydrogen, nitrogen, argon and ultra-high purity compressed dry air (UHPCDA) are the most common gases utilized at the scanner and source level. Purity requirements are tighter than for previous technology node tools. In addition, specifically for hydrogen, EUV tool users are facing not only gas purity challenges but also the need for safe disposal of the hydrogen at the tool outlet. Recovery, reuse or recycling strategies could mitigate the disposal process and reduce the overall tool cost of operation. This paper will review the types of purification technologies that are currently available to generate high purity hydrogen suitable for EUV applications. Advantages and disadvantages of each purification technology will be presented. Guidelines on how to select the most appropriate technology for each application and experimental conditions will be presented. A discussion of the most common approaches utilized at the facility level to operate EUV tools along with possible hydrogen recovery strategies will also be reported.

  18. Actinic inspection of multilayer defects on EUV masks

    International Nuclear Information System (INIS)

    Barty, A; Liu, Y; Gullikson, E; Taylor, J S; Wood, O

    2005-01-01

    The production of defect-free mask blanks, and the development of techniques for inspecting and qualifying EUV mask blanks, remains a key challenge for EUV lithography. In order to ensure a reliable supply of defect-free mask blanks, it is necessary to develop techniques to reliably and accurately detect defects on un-patterned mask blanks. These inspection tools must be able to accurately detect all critical defects whilst simultaneously having the minimum possible false-positive detection rate. There continues to be improvement in high-speed non-actinic mask blank inspection tools, and it is anticipated that these tools can and will be used by industry to qualify EUV mask blanks. However, the outstanding question remains one of validating that non-actinic inspection techniques are capable of detecting all printable EUV defects. To qualify the performance of non-actinic inspection tools, a unique dual-mode EUV mask inspection system has been installed at the Advanced Light Source (ALS) synchrotron at Lawrence Berkeley National Laboratory. In high-speed inspection mode, whole mask blanks are scanned for defects using 13.5-nm wavelength light to identify and map all locations on the mask that scatter a significant amount of EUV light. In imaging, or defect review mode, a zone plate is placed in the reflected beam path to image a region of interest onto a CCD detector with an effective resolution on the mask of 100-nm or better. Combining the capabilities of the two inspection tools into one system provides the unique capability to determine the coordinates of native defects that can be used to compare actinic defect inspection with visible light defect inspection tools under commercial development, and to provide data for comparing scattering models for EUV mask defects

  19. Free electron lasers for 13nm EUV lithography: RF design strategies to minimise investment and operational costs

    Science.gov (United States)

    Keens, Simon; Rossa, Bernhard; Frei, Marcel

    2016-03-01

    As the semiconductor industry proceeds to develop ever better sources of extreme ultraviolet (EUV) light for photolithography applications, two distinct technologies have come to prominence: Tin-plasma and free electron laser (FEL) sources. Tin plasma sources have been in development within the industry for many years, and have been widely reported. Meanwhile, FELs represent the most promising alternative to create high power EUV frequencies and, while tin-plasma source development has been ongoing, such lasers have been continuously developed by academic institutions for use in fundamental research programmes in conjunction with universities and national scientific institutions. This paper follows developments in the field of academic FELs, and presents information regarding novel technologies, specifically in the area of RF design strategy, that may be incorporated into future industrial FEL systems for EUV lithography in order to minimize the necessary investment and operational costs. It goes on to try to assess the cost-benefit of an alternate RF design strategy, based upon previous studies.

  20. Stellar observations with the Voyager EUV objective grating spectrograph

    International Nuclear Information System (INIS)

    Holberg, J.B.; Polidan, R.S.; Barry, D.C.

    1986-01-01

    During the periods of interplanetary cruise the Voyager ultraviolet spectrometers are used to provide unique and otherwise unobtainable observations in the extreme ultraviolet (EUV, 500 to 1200) and the far ultraviolet (FUV, 912 to 1220 A). These observations include the spectra of hot stellar sources as well as emission from the interplanetary medium. Recent results of note include: (1) extensive spectrophotometric coverage of a superoutburst of the dwarf nova VW Hydri, which showed a clear 1/2 day delay in the outburst at 1000 A relative to that observed in the optical and a curious dip in the FUV light curve near maximum light. The Voyager observations were part of a comprehensive and highly successful campaign involving EXOSAT, IUE and ground based observations of this dwarf nova; (2) a comprehensive study of Be star spectra and variability. These results show the critical importance of FUV observations in the study of the effects of stellar rotation in hot stars; (3) the detection of a strong O VI absorption feature in the spectrum of the PG 1159-like object H1504+65. This detection along with the optical identification of weak O IV lines was a key to the interpretation of this object; which is of extremely high (>150,000K) temperature and appears to be a unique example of a stellar atmosphere devoid of H and He; (4) an analysis of an extremely long duration spectrum of the EUV and FUV sky background, which establishes important new upper limits on both continuum and line emission. This result also provide the first detection of interplanetary Lyman gamma

  1. Benchmarking EUV mask inspection beyond 0.25 NA

    International Nuclear Information System (INIS)

    Goldberg, Kenneth A.; Mochi, Iacopo; Anderson, Erik H.; Rekawa, Seno B.; Kemp, Charles D.; Huh, S.; Han, H.-S.; Naulleau, P.; Gunion, R.F.

    2008-01-01

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV-wavelength mask inspection microscope designed for direct aerial image measurements, and pre-commercial EUV mask research. Operating on a synchrotron bending magnet beamline, the AIT uses an off-axis Fresnel zoneplate lens to project a high-magnification EUV image directly onto a CCD camera. We present the results of recent system upgrades that have improved the imaging resolution, illumination uniformity, and partial coherence. Benchmarking tests show image contrast above 75% for 100-nm mask features, and significant improvements and across the full range of measured sizes. The zoneplate lens has been replaced by an array of user-selectable zoneplates with higher magnification and NA values up to 0.0875, emulating the spatial resolution of a 0.35-NA 4 x EUV stepper. Illumination uniformity is above 90% for mask areas 2-(micro)m-wide and smaller. An angle-scanning mirror reduces the high coherence of the synchrotron beamline light source giving measured σ values of approximately 0.125 at 0.0875 NA

  2. Laser-induced extreme UV radiation sources for manufacturing next-generation integrated circuits

    International Nuclear Information System (INIS)

    Borisov, V M; Vinokhodov, A Yu; Ivanov, A S; Kiryukhin, Yu B; Mishchenko, V A; Prokof'ev, A V; Khristoforov, O B

    2009-01-01

    The development of high-power discharge sources emitting in the 13.5±0.135-nm spectral band is of current interest because they are promising for applications in industrial EUV (extreme ultraviolet) lithography for manufacturing integrated circuits according to technological precision standards of 22 nm and smaller. The parameters of EUV sources based on a laser-induced discharge in tin vapours between rotating disc electrodes are investigated. The properties of the discharge initiation by laser radiation at different wavelengths are established and the laser pulse parameters providing the maximum energy characteristics of the EUV source are determined. The EUV source developed in the study emits an average power of 276 W in the 13.5±0.135-nm spectral band on conversion to the solid angle 2π sr in the stationary regime at a pulse repetition rate of 3000 Hz. (laser applications and other topics in quantum electronics)

  3. Sub 20nm particle inspection on EUV mask blanks

    NARCIS (Netherlands)

    Bussink, P.G.W.; Volatier, J.B.; Walle, P. van der; Fritz, E.C.; Donck, J.C.J. van der

    2016-01-01

    The Rapid Nano is a particle inspection system developed by TNO for the qualification of EUV reticle handling equipment. The detection principle of this system is dark-field microscopy. The performance of the system has been improved via model-based design. Through our model of the scattering

  4. Study of EUV induced defects on few-layer graphene

    NARCIS (Netherlands)

    Gao, An; Rizo, P.J.; Zoethout, E.; Scaccabarozzi, L.; Lee, Christopher James; Banine, V.; Bijkerk, Frederik

    2012-01-01

    Defects in graphene greatly affect its properties1-3. Radiation induced-defects may reduce the long-term survivability of graphene-based nano-devices. Here, we expose few-layer graphene to extreme ultraviolet (EUV, 13.5nm) radiation and show there is a power-dependent increase in defect density. We

  5. From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer Institute

    Science.gov (United States)

    Buitrago, Elizabeth; Fallica, Roberto; Fan, Daniel; Karim, Waiz; Vockenhuber, Michaela; van Bokhoven, Jeroen A.; Ekinci, Yasin

    2016-09-01

    Extreme ultraviolet interference lithography (EUV-IL, λ = 13.5 nm) has been shown to be a powerful technique not only for academic, but also for industrial research and development of EUV materials due to its relative simplicity yet record high-resolution patterning capabilities. With EUV-IL, it is possible to pattern high-resolution periodic images to create highly ordered nanostructures that are difficult or time consuming to pattern by electron beam lithography (EBL) yet interesting for a wide range of applications such as catalysis, electronic and photonic devices, and fundamental materials analysis, among others. Here, we will show state-of the-art research performed using the EUV-IL tool at the Swiss Light Source (SLS) synchrotron facility in the Paul Scherrer Institute (PSI). For example, using a grating period doubling method, a diffraction mask capable of patterning a world record in photolithography of 6 nm half-pitch (HP), was produced. In addition to the description of the method, we will give a few examples of applications of the technique. Well-ordered arrays of suspended silicon nanowires down to 6.5 nm linewidths have been fabricated and are to be studied as field effect transistors (FETs) or biosensors, for instance. EUV achromatic Talbot lithography (ATL), another interference scheme that utilizes a single grating, was shown to yield well-defined nanoparticles over large-areas with high uniformity presenting great opportunities in the field of nanocatalysis. EUV-IL is in addition, playing a key role in the future introduction of EUV lithography into high volume manufacturing (HVM) of semiconductor devices for the 7 and 5 nm logic node (16 nm and 13 nm HP, respectively) and beyond while the availability of commercial EUV-tools is still very much limited for research.

  6. The EUV spectrophotometer on Atmosphere Explorer.

    Science.gov (United States)

    Hinteregger, H. E.; Bedo, D. E.; Manson, J. E.

    1973-01-01

    An extreme ultraviolet (EUV) spectrophotometer for measurements of solar radiation at wavelengths ranging from 140 to 1850 A will be included in the payload of each of the three Atmosphere-Explorer (AE) missions, AE-C, -D, and -E. The instrument consists of 24 grating monochromators, 12 of which can be telecommanded either to execute 128-step scans each covering a relatively small section of the total spectrophotometer wavelength range or to maintain fixed (command-selected) wavelength positions. The remaining 12 nonscan monochromators operate at permanently fixed wavelengths and view only a small fraction of the solar disk except for one viewing the whole sun in H Lyman alpha. Ten of the 12 scan-capable monochromators also view the entire solar disk since their primary function is to measure the total fluxes independent of the distribution of sources across the solar disk.

  7. Correlations between variations in solar EUV and soft X-ray irradiance and photoelectron energy spectra observed on Mars and Earth

    Science.gov (United States)

    Peterson, W. K.; Brain, D. A.; Mitchell, D. L.; Bailey, S. M.; Chamberlin, P. C.

    2013-11-01

    extreme ultraviolet (EUV; 10-120 nm) and soft X-ray (XUV; 0-10 nm) radiation are major heat sources for the Mars thermosphere as well as the primary source of ionization that creates the ionosphere. In investigations of Mars thermospheric chemistry and dynamics, solar irradiance models are used to account for variations in this radiation. Because of limited proxies, irradiance models do a poor job of tracking the significant variations in irradiance intensity in the EUV and XUV ranges over solar rotation time scales when the Mars-Sun-Earth angle is large. Recent results from Earth observations show that variations in photoelectron energy spectra are useful monitors of EUV and XUV irradiance variability. Here we investigate photoelectron energy spectra observed by the Mars Global Surveyor (MGS) Electron Reflectometer (ER) and the FAST satellite during the interval in 2005 when Earth, Mars, and the Sun were aligned. The Earth photoelectron data in selected bands correlate well with calculations based on 1 nm resolution observations above 27 nm supplemented by broadband observations and a solar model in the 0-27 nm range. At Mars, we find that instrumental and orbital limitations to the identifications of photoelectron energy spectra in MGS/ER data preclude their use as a monitor of solar EUV and XUV variability. However, observations with higher temporal and energy resolution obtained at lower altitudes on Mars might allow the separation of the solar wind and ionospheric components of electron energy spectra so that they could be used as reliable monitors of variations in solar EUV and XUV irradiance than the time shifted, Earth-based, F10.7 index currently used.

  8. Correlations Between Variations in Solar EUV and Soft X-Ray Irradiance and Photoelectron Energy Spectra Observed on Mars and Earth

    Science.gov (United States)

    Peterson, W. K.; Brain, D. A.; Mitchell, D. L.; Bailey, S. M.; Chamberlin, P. C.

    2013-01-01

    Solar extreme ultraviolet (EUV; 10-120 nm) and soft X-ray (XUV; 0-10 nm) radiation are major heat sources for the Mars thermosphere as well as the primary source of ionization that creates the ionosphere. In investigations of Mars thermospheric chemistry and dynamics, solar irradiance models are used to account for variations in this radiation. Because of limited proxies, irradiance models do a poor job of tracking the significant variations in irradiance intensity in the EUV and XUV ranges over solar rotation time scales when the Mars-Sun-Earth angle is large. Recent results from Earth observations show that variations in photoelectron energy spectra are useful monitors of EUV and XUV irradiance variability. Here we investigate photoelectron energy spectra observed by the Mars Global Surveyor (MGS) Electron Reflectometer (ER) and the FAST satellite during the interval in 2005 when Earth, Mars, and the Sun were aligned. The Earth photoelectron data in selected bands correlate well with calculations based on 1 nm resolution observations above 27 nm supplemented by broadband observations and a solar model in the 0-27 nm range. At Mars, we find that instrumental and orbital limitations to the identifications of photoelectron energy spectra in MGS/ER data preclude their use as a monitor of solar EUV and XUV variability. However, observations with higher temporal and energy resolution obtained at lower altitudes on Mars might allow the separation of the solar wind and ionospheric components of electron energy spectra so that they could be used as reliable monitors of variations in solar EUV and XUV irradiance than the time shifted, Earth-based, F(10.7) index currently used.

  9. Integrated approach to improving local CD uniformity in EUV patterning

    Science.gov (United States)

    Liang, Andrew; Hermans, Jan; Tran, Timothy; Viatkina, Katja; Liang, Chen-Wei; Ward, Brandon; Chuang, Steven; Yu, Jengyi; Harm, Greg; Vandereyken, Jelle; Rio, David; Kubis, Michael; Tan, Samantha; Dusa, Mircea; Singhal, Akhil; van Schravendijk, Bart; Dixit, Girish; Shamma, Nader

    2017-03-01

    Extreme ultraviolet (EUV) lithography is crucial to enabling technology scaling in pitch and critical dimension (CD). Currently, one of the key challenges of introducing EUV lithography to high volume manufacturing (HVM) is throughput, which requires high source power and high sensitivity chemically amplified photoresists. Important limiters of high sensitivity chemically amplified resists (CAR) are the effects of photon shot noise and resist blur on the number of photons received and of photoacids generated per feature, especially at the pitches required for 7 nm and 5 nm advanced technology nodes. These stochastic effects are reflected in via structures as hole-to-hole CD variation or local CD uniformity (LCDU). Here, we demonstrate a synergy of film stack deposition, EUV lithography, and plasma etch techniques to improve LCDU, which allows the use of high sensitivity resists required for the introduction of EUV HVM. Thus, to improve LCDU to a level required by 5 nm node and beyond, film stack deposition, EUV lithography, and plasma etch processes were combined and co-optimized to enhance LCDU reduction from synergies. Test wafers were created by depositing a pattern transfer stack on a substrate representative of a 5 nm node target layer. The pattern transfer stack consisted of an atomically smooth adhesion layer and two hardmasks and was deposited using the Lam VECTOR PECVD product family. These layers were designed to mitigate hole roughness, absorb out-of-band radiation, and provide additional outlets for etch to improve LCDU and control hole CD. These wafers were then exposed through an ASML NXE3350B EUV scanner using a variety of advanced positive tone EUV CAR. They were finally etched to the target substrate using Lam Flex dielectric etch and Kiyo conductor etch systems. Metrology methodologies to assess dimensional metrics as well as chip performance and defectivity were investigated to enable repeatable patterning process development. Illumination

  10. At-wavelength interferometry of high-NA diffraction-limited EUV optics

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Naulleau, Patrick; Rekawa, Senajith; Denham, Paul; Liddle, J. Alexander; Anderson, Erik; Jackson, Keith; Bokor, Jeffrey; Attwood, David

    2003-08-01

    Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the development of advanced lithographic techniques required for EUV lithography, including the creation and testing of new, high-resolution photoresists. One such system is installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. Sub{angstrom}-accuracy optical testing and alignment techniques, developed for use with the previous generations of EUV lithographic optical systems, are being extended for use at high NA. Considerations for interferometer design and use are discussed.

  11. At-wavelength interferometry of high-NA diffraction-limited EUV optics

    International Nuclear Information System (INIS)

    Goldberg, Kenneth A.; Naulleau, Patrick; Rekawa, Senajith; Denham, Paul; Liddle, J. Alexander; Anderson, Erik; Jackson, Keith; Bokor, Jeffrey; Attwood, David

    2003-01-01

    Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the development of advanced lithographic techniques required for EUV lithography, including the creation and testing of new, high-resolution photoresists. One such system is installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. Sub(angstrom)-accuracy optical testing and alignment techniques, developed for use with the previous generations of EUV lithographic optical systems, are being extended for use at high NA. Considerations for interferometer design and use are discussed

  12. Extreme Ultraviolet Explorer Bright Source List

    Science.gov (United States)

    Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

    1994-01-01

    Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

  13. Experimental and theoretical study on emission spectra of a nitrogen photoionized plasma induced by intense EUV pulses

    Directory of Open Access Journals (Sweden)

    Saber Ismail

    2018-01-01

    Full Text Available Spectral lines of low-temperature nitrogen photoionized plasma were investigated. The photoionized plasma was created in the result of irradiation N2 gas using laser plasma EUV radiation pulses. The source was based on a 10J/10ns Nd:YAG (λ = 1064 nm laser system and a gas puff target. The EUV radiation pulses were collected and focused using a grazing incidence multifoil EUV collector. The emission spectra were measured in the ultraviolet and visible (UV/Vis range. It was found that the plasma emission lines in the lower region of the UV range are relativley weak. Nonetheless, a part of the spectra contains strong molecular band in the 300 - 430 nm originated from second positive and first negative systems band transitions of nitrogen. These molecular band transitions were identified using a code for study the diatomic molecules, LIFBASE. The vibrational band of Δv = 0 and ±1 transitions were significantly populated than of that with Δv = ±2 and 3 transitions. A comparison of the calculated and measured spectrum is presented. With an assumption of a local thermodynamic equilibrium (LTE, the vibrational temperature was determined from the integrated band intensities with the help of the Boltzmann plot method and compared to the temperature predicted by SPECAIR and LIFBASE simulations. A summary of the results and the variations in the vibrational temperatures was discussed.

  14. Experimental and theoretical study on emission spectra of a nitrogen photoionized plasma induced by intense EUV pulses

    Science.gov (United States)

    Saber, Ismail; Bartnik, Andrzej; Skrzeczanowski, Wojciech; Wachulak, Przemyslaw; Jarocki, Roman; Fiedorowicz, Henryk; Limpouch, Jiri

    2018-01-01

    Spectral lines of low-temperature nitrogen photoionized plasma were investigated. The photoionized plasma was created in the result of irradiation N2 gas using laser plasma EUV radiation pulses. The source was based on a 10J/10ns Nd:YAG (λ = 1064 nm) laser system and a gas puff target. The EUV radiation pulses were collected and focused using a grazing incidence multifoil EUV collector. The emission spectra were measured in the ultraviolet and visible (UV/Vis) range. It was found that the plasma emission lines in the lower region of the UV range are relativley weak. Nonetheless, a part of the spectra contains strong molecular band in the 300 - 430 nm originated from second positive and first negative systems band transitions of nitrogen. These molecular band transitions were identified using a code for study the diatomic molecules, LIFBASE. The vibrational band of Δv = 0 and ±1 transitions were significantly populated than of that with Δv = ±2 and 3 transitions. A comparison of the calculated and measured spectrum is presented. With an assumption of a local thermodynamic equilibrium (LTE), the vibrational temperature was determined from the integrated band intensities with the help of the Boltzmann plot method and compared to the temperature predicted by SPECAIR and LIFBASE simulations. A summary of the results and the variations in the vibrational temperatures was discussed.

  15. Studies of EUV contamination mitigation

    Science.gov (United States)

    Graham, Samual, Jr.; Malinowski, Michael E.; Steinhaus, Chip; Grunow, Philip A.; Klebanoff, Leonard E.

    2002-07-01

    Carbon contamination removal was investigated using remote RF-O2, RF-H2, and atomic hydrogen experiments. Samples consisted of silicon wafers coated with 100 Angstrom sputtered carbon, as well as bare Si-capped Mo/Si optics. Samples were exposed to atomic hydrogen or RF plasma discharges at 100 W, 200 W, and 300 W. Carbon removal rate, optic oxidation rate, at-wavelength (13.4 nm) peak reflectance, and optic surface roughness were characterized. Data show that RF- O2 removes carbon at a rate approximately 6 times faster RF- H2 for a given discharge power. However, both cleaning techniques induce Mo/Si optic degradation through the loss of reflectivity associated with surface oxide growth for RF-O2 and an unknown mechanism with hydrogen cleaning. Atomic hydrogen cleaning shows carbon removal rates sufficient for use as an in-situ cleaning strategy for EUVoptics with less risk of optic degradation from overexposures than RF-discharge cleaning. While hydrogen cleaning (RF and atomic) of EUV optics has proven effective in carbon removal, attempts to dissociate hydrogen in co-exposures with EUV radiation have resulted in no detectable removal of carbon contamination.

  16. Accelerator based continuous neutron source.

    CERN Document Server

    Shapiro, S M; Ruggiero, A G

    2003-01-01

    Until the last decade, most neutron experiments have been performed at steady-state, reactor-based sources. Recently, however, pulsed spallation sources have been shown to be very useful in a wide range of neutron studies. A major review of neutron sources in the US was conducted by a committee chaired by Nobel laureate Prof. W. Kohn: ''Neutron Sources for America's Future-BESAC Panel on Neutron Sources 1/93''. This distinguished panel concluded that steady state and pulsed sources are complementary and that the nation has need for both to maintain a balanced neutron research program. The report recommended that both a new reactor and a spallation source be built. This complementarity is recognized worldwide. The conclusion of this report is that a new continuous neutron source is needed for the second decade of the 20 year plan to replace aging US research reactors and close the US neutron gap. it is based on spallation production of neutrons using a high power continuous superconducting linac to generate pr...

  17. Towards a contamination-tolerant EUV power sensor

    NARCIS (Netherlands)

    Veldhoven, J. van; Putten, M. van; Nieuwkoop, E.; Huijser, T.; Maas, D.J.

    2015-01-01

    In EUV Lithography short-, mid- and long-term control over in-band EUV power is needed for high-yield IC production. Existing sensors can be unstable over time due to contamination and/or degradation. TNO goal: to conceive a stable EUV power sensor. Sensitive to in-band EUV, negligible degradation,

  18. Update on EUV radiometry at PTB

    Science.gov (United States)

    Laubis, Christian; Barboutis, Annett; Buchholz, Christian; Fischer, Andreas; Haase, Anton; Knorr, Florian; Mentzel, Heiko; Puls, Jana; Schönstedt, Anja; Sintschuk, Michael; Soltwisch, Victor; Stadelhoff, Christian; Scholze, Frank

    2016-03-01

    The development of technology infrastructure for EUV Lithography (EUVL) still requires higher levels of technology readiness in many fields. A large number of new materials will need to be introduced. For example, development of EUV compatible pellicles to adopt an approved method from optical lithography for EUVL needs completely new thin membranes which have not been available before. To support these developments, PTB with its decades of experience [1] in EUV metrology [2] provides a wide range of actinic and non actinic measurements at in-band EUV wavelengths as well as out of band. Two dedicated, complimentary EUV beamlines [3] are available for radiometric [4,5] characterizations benefiting from small divergence or from adjustable spot size respectively. The wavelength range covered reaches from below 1 nm to 45 nm [6] for the EUV beamlines [7] to longer wavelengths if in addition the VUV beamline is employed. The standard spot size is 1 mm by 1 mm with an option to go as low as 0.1 mm to 0.1 mm. A separate beamline offers an exposure setup. Exposure power levels of 20 W/cm2 have been employed in the past, lower fluencies are available by attenuation or out of focus exposure. Owing to a differential pumping stage, the sample can be held under defined gas conditions during exposure. We present an updated overview on our instrumentation and analysis capabilities for EUV metrology and provide data for illustration.

  19. EUV mask process specifics and development challenges

    Science.gov (United States)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  20. LASER APPLICATIONS AND OTHER TOPICS IN QUANTUM ELECTRONICS: Laser-induced extreme UV radiation sources for manufacturing next-generation integrated circuits

    Science.gov (United States)

    Borisov, V. M.; Vinokhodov, A. Yu; Ivanov, A. S.; Kiryukhin, Yu B.; Mishchenko, V. A.; Prokof'ev, A. V.; Khristoforov, O. B.

    2009-10-01

    The development of high-power discharge sources emitting in the 13.5±0.135-nm spectral band is of current interest because they are promising for applications in industrial EUV (extreme ultraviolet) lithography for manufacturing integrated circuits according to technological precision standards of 22 nm and smaller. The parameters of EUV sources based on a laser-induced discharge in tin vapours between rotating disc electrodes are investigated. The properties of the discharge initiation by laser radiation at different wavelengths are established and the laser pulse parameters providing the maximum energy characteristics of the EUV source are determined. The EUV source developed in the study emits an average power of 276 W in the 13.5±0.135-nm spectral band on conversion to the solid angle 2π sr in the stationary regime at a pulse repetition rate of 3000 Hz.

  1. Automated Identification of Coronal Holes from Synoptic EUV Maps

    Science.gov (United States)

    Hamada, Amr; Asikainen, Timo; Virtanen, Ilpo; Mursula, Kalevi

    2018-04-01

    Coronal holes (CHs) are regions of open magnetic field lines in the solar corona and the source of the fast solar wind. Understanding the evolution of coronal holes is critical for solar magnetism as well as for accurate space weather forecasts. We study the extreme ultraviolet (EUV) synoptic maps at three wavelengths (195 Å/193 Å, 171 Å and 304 Å) measured by the Solar and Heliospheric Observatory/Extreme Ultraviolet Imaging Telescope (SOHO/EIT) and the Solar Dynamics Observatory/Atmospheric Imaging Assembly (SDO/AIA) instruments. The two datasets are first homogenized by scaling the SDO/AIA data to the SOHO/EIT level by means of histogram equalization. We then develop a novel automated method to identify CHs from these homogenized maps by determining the intensity threshold of CH regions separately for each synoptic map. This is done by identifying the best location and size of an image segment, which optimally contains portions of coronal holes and the surrounding quiet Sun allowing us to detect the momentary intensity threshold. Our method is thus able to adjust itself to the changing scale size of coronal holes and to temporally varying intensities. To make full use of the information in the three wavelengths we construct a composite CH distribution, which is more robust than distributions based on one wavelength. Using the composite CH dataset we discuss the temporal evolution of CHs during the Solar Cycles 23 and 24.

  2. Prospects of DUV OoB suppression techniques in EUV lithography

    Science.gov (United States)

    Park, Chang-Min; Kim, Insung; Kim, Sang-Hyun; Kim, Dong-Wan; Hwang, Myung-Soo; Kang, Soon-Nam; Park, Cheolhong; Kim, Hyun-Woo; Yeo, Jeong-Ho; Kim, Seong-Sue

    2014-04-01

    Though scaling of source power is still the biggest challenge in EUV lithography (EUVL) technology era, CD and overlay controls for transistor's requirement are also precondition of adopting EUVL in mass production. Two kinds of contributors are identified as risks for CDU and Overlay: Infrared (IR) and deep ultraviolet (DUV) out of band (OOB) radiations from laser produced plasma (LPP) EUV source. IR from plasma generating CO2 laser that causes optics heating and wafer overlay error is well suppressed by introducing grating on collector to diffract IR off the optical axis and is the effect has been confirmed by operation of pre-production tool (NXE3100). EUV and DUV OOB which are reflected from mask black boarder (BB) are root causes of EUV-specific CD error at the boundaries of exposed shots which would result in the problem of CDU out of spec unless sufficiently suppressed. Therefore, control of DUV OOB reflection from the mask BB is one of the key technologies that must be developed prior to EUV mass production. In this paper, quantitative assessment on the advantage and the disadvantage of potential OOB solutions will be discussed. EUV and DUV OOB impacts on wafer CDs are measured from NXE3100 & NXE3300 experiments. Significant increase of DUV OOB impact on CD from NXE3300 compared with NXE3100 is observed. There are three ways of technology being developed to suppress DUV OOB: spectral purity filter (SPF) as a scanner solution, multi-layer etching as a solution on mask, and resist top-coating as a process solution. PROs and CONs of on-scanner, on-mask, and on-resist solution for the mass production of EUV lithography will be discussed.

  3. Estimation of soft X-ray and EUV transition radiation power emitted from the MIRRORCLE-type tabletop synchrotron.

    Science.gov (United States)

    Toyosugi, N; Yamada, H; Minkov, D; Morita, M; Yamaguchi, T; Imai, S

    2007-03-01

    The tabletop synchrotron light sources MIRRORCLE-6X and MIRRORCLE-20SX, operating at electron energies E(el) = 6 MeV and E(el) = 20 MeV, respectively, can emit powerful transition radiation (TR) in the extreme ultraviolet (EUV) and the soft X-ray regions. To clarify the applicability of these soft X-ray and EUV sources, the total TR power has been determined. A TR experiment was performed using a 385 nm-thick Al foil target in MIRRORCLE-6X. The angular distribution of the emitted power was measured using a detector assembly based on an NE102 scintillator, an optical bundle and a photomultiplier. The maximal measured total TR power for MIRRORCLE-6X is P(max) approximately equal 2.95 mW at full power operation. Introduction of an analytical expression for the lifetime of the electron beam allows calculation of the emitted TR power by a tabletop synchrotron light source. Using the above measurement result, and the theoretically determined ratio between the TR power for MIRRORCLE-6X and MIRRORCLE-20SX, the total TR power for MIRRORCLE-20SX can be obtained. The one-foil TR target thickness is optimized for the 20 MeV electron energy. P(max) approximately equal 810 mW for MIRRORCLE-20SX is obtained with a single foil of 240 nm-thick Be target. The emitted bremsstrahlung is negligible with respect to the emitted TR for optimized TR targets. From a theoretically known TR spectrum it is concluded that MIRRORCLE-20SX can emit 150 mW of photons with E > 500 eV, which makes it applicable as a source for performing X-ray lithography. The average wavelength, \\overline\\lambda = 13.6 nm, of the TR emission of MIRRORCLE-20SX, with a 200 nm Al target, could provide of the order of 1 W EUV.

  4. Solar EUV irradiance for space weather applications

    Science.gov (United States)

    Viereck, R. A.

    2015-12-01

    Solar EUV irradiance is an important driver of space weather models. Large changes in EUV and x-ray irradiances create large variability in the ionosphere and thermosphere. Proxies such as the F10.7 cm radio flux, have provided reasonable estimates of the EUV flux but as the space weather models become more accurate and the demands of the customers become more stringent, proxies are no longer adequate. Furthermore, proxies are often provided only on a daily basis and shorter time scales are becoming important. Also, there is a growing need for multi-day forecasts of solar EUV irradiance to drive space weather forecast models. In this presentation we will describe the needs and requirements for solar EUV irradiance information from the space weather modeler's perspective. We will then translate these requirements into solar observational requirements such as spectral resolution and irradiance accuracy. We will also describe the activities at NOAA to provide long-term solar EUV irradiance observations and derived products that are needed for real-time space weather modeling.

  5. Driving down defect density in composite EUV patterning film stacks

    Science.gov (United States)

    Meli, Luciana; Petrillo, Karen; De Silva, Anuja; Arnold, John; Felix, Nelson; Johnson, Richard; Murray, Cody; Hubbard, Alex; Durrant, Danielle; Hontake, Koichi; Huli, Lior; Lemley, Corey; Hetzer, Dave; Kawakami, Shinichiro; Matsunaga, Koichi

    2017-03-01

    Extreme ultraviolet lithography (EUVL) technology is one of the leading candidates for enabling the next generation devices, for 7nm node and beyond. As the technology matures, further improvement is required in the area of blanket film defectivity, pattern defectivity, CD uniformity, and LWR/LER. As EUV pitch scaling approaches sub 20 nm, new techniques and methods must be developed to reduce the overall defectivity, mitigate pattern collapse and eliminate film related defect. IBM Corporation and Tokyo Electron Limited (TELTM) are continuously collaborating to develop manufacturing quality processes for EUVL. In this paper, we review key defectivity learning required to enable 7nm node and beyond technology. We will describe ongoing progress in addressing these challenges through track-based processes (coating, developer, baking), highlighting the limitations of common defect detection strategies and outlining methodologies necessary for accurate characterization and mitigation of blanket defectivity in EUV patterning stacks. We will further discuss defects related to pattern collapse and thinning of underlayer films.

  6. Advanced 0.3-NA EUV lithography capabilities at the ALS

    International Nuclear Information System (INIS)

    Naulleau, Patrick; Anderson, Erik; Dean, Kim; Denham, Paul; Goldberg, Kenneth A.; Hoef, Brian; Jackson, Keith

    2005-01-01

    For volume nanoelectronics production using Extreme ultraviolet (EUV) lithography [1] to become a reality around the year 2011, advanced EUV research tools are required today. Microfield exposure tools have played a vital role in the early development of EUV lithography [2-4] concentrating on numerical apertures (NA) of 0.2 and smaller. Expected to enter production at the 32-nm node with NAs of 0.25, EUV can no longer rely on these early research tools to provide relevant learning. To overcome this problem, a new generation of microfield exposure tools, operating at an NA of 0.3 have been developed [5-8]. Like their predecessors, these tools trade off field size and speed for greatly reduced complexity. One of these tools is implemented at Lawrence Berkeley National Laboratory's Advanced Light Source synchrotron radiation facility. This tool gets around the problem of the intrinsically high coherence of the synchrotron source [9,10] by using an active illuminator scheme [11]. Here we describe recent printing results obtained from the Berkeley EUV exposure tool. Limited by the availability of ultra-high resolution chemically amplified resists, present resolution limits are approximately 32 nm for equal lines and spaces and 27 nm for semi-isolated lines

  7. TESIS experiment on EUV imaging spectroscopy of the Sun

    Science.gov (United States)

    Kuzin, S. V.; Bogachev, S. A.; Zhitnik, I. A.; Pertsov, A. A.; Ignatiev, A. P.; Mitrofanov, A. M.; Slemzin, V. A.; Shestov, S. V.; Sukhodrev, N. K.; Bugaenko, O. I.

    2009-03-01

    TESIS is a set of solar imaging instruments in development by the Lebedev Physical Institute of the Russian Academy of Science, to be launched aboard the Russian spacecraft CORONAS-PHOTON in December 2008. The main goal of TESIS is to provide complex observations of solar active phenomena from the transition region to the inner and outer solar corona with high spatial, spectral and temporal resolution in the EUV and Soft X-ray spectral bands. TESIS includes five unique space instruments: the MgXII Imaging Spectroheliometer (MISH) with spherical bent crystal mirror, for observations of the Sun in the monochromatic MgXII 8.42 Å line; the EUV Spectoheliometer (EUSH) with grazing incidence difraction grating, for the registration of the full solar disc in monochromatic lines of the spectral band 280-330 Å; two Full-disk EUV Telescopes (FET) with multilayer mirrors covering the band 130-136 and 290-320 Å; and the Solar EUV Coronagraph (SEC), based on the Ritchey-Chretien scheme, to observe the inner and outer solar corona from 0.2 to 4 solar radii in spectral band 290-320 Å. TESIS experiment will start at the rising phase of the 24th cycle of solar activity. With the advanced capabilities of its instruments, TESIS will help better understand the physics of solar flares and high-energy phenomena and provide new data on parameters of solar plasma in the temperature range 10-10K. This paper gives a brief description of the experiment, its equipment, and its scientific objectives.

  8. Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists

    International Nuclear Information System (INIS)

    Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael J.; Younkin, Todd R.; Whittaker, Andrew K.

    2011-01-01

    Poly(olefin sulfone)s, formed by the reaction of sulfur dioxide (SO 2 ) and an olefin, are known to be highly susceptible to degradation by radiation and thus have been identified as candidate materials for chain scission-based extreme ultraviolet lithography (EUVL) resist materials. In order to investigate this further, the synthesis and characterisation of two poly(olefin sulfone)s namely poly(1-pentene sulfone) (PPS) and poly(2-methyl-1-pentene sulfone) (PMPS), was achieved and the two materials were evaluated for possible chain scission EUVL resist applications. It was found that both materials possess high sensitivities to EUV photons; however; the rates of outgassing were extremely high. The only observed degradation products were found to be SO 2 and the respective olefin suggesting that depolymerisation takes place under irradiation in a vacuum environment. In addition to depolymerisation, a concurrent conversion of SO 2 moieties to a sulfide phase was observed using XPS.

  9. Extreme Ultraviolet (EUV) induced surface chemistry on Ru

    NARCIS (Netherlands)

    Liu, Feng; Sturm, Jacobus Marinus; Lee, Christopher James; Bijkerk, Frederik

    2013-01-01

    EUV photon induced surface chemistry can damage multilayer mirrors causing reflectivity loss and faster degradation. EUV photo chemistry involves complex processes including direct photon induced surface chemistry and secondary electron radiation chemistry. Current cleaning techniques include dry

  10. The EUV Helium Spectrum in the Quiet Sun: A By-Product of Coronal Emission?

    Science.gov (United States)

    Andretta, Vincenzo; DelZanna, Giulio; Jordan, Stuart D.; Oegerle, William (Technical Monitor)

    2002-01-01

    In this paper we test one of the mechanisms proposed to explain the intensities and other observed properties of the solar helium spectrum, and in particular of its Extreme-Ultraviolet (EUV) resonance lines. The so-called Photoionisation-Recombination (P-R) mechanism involves photoionisation of helium atoms and ions by EUV coronal radiation, followed by recombination cascades. We present calibrated measurements of EUV flux obtained with the two CDS spectrometers on board SOHO, in quiescent solar regions. We were able to obtain an essentially complete estimate of the total photoionizing flux in the wavelength range below 504 A (the photoionisation threshold for He(I)), as well as simultaneous measurements with the same instruments of the intensities of the strongest EUV helium lines: He(II) lambda304, He(I) lambda584, and He(I) lambda537. We find that there are not enough EUV photons to account for the observed helium line intensities. More specifically, we conclude that He(II) intensities cannot be explained by the P-R mechanism. Our results, however, leave open the possibility that the He(I) spectrum could be formed by the P-R mechanism, with the He(II) lambda304 line as a significant photoionizating source.

  11. Laser-produced multi-charged heavy ions as efficient soft x-ray sources

    International Nuclear Information System (INIS)

    Higashiguchi, Takeshi; Suzuki, Yuhei; Kawasaki, Masato

    2016-01-01

    We demonstrate EUV and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6x nm and a water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on a high-Z plasma UTA source, coupled to x-ray optics. We will discuss the progress and Z-scaling of UTA emission spectra to achieve lab-scale table-top, efficient, high-brightness high-Z plasma EUV-soft x-ray sources for in vivo bio-imaging applications. (author)

  12. Enabling laboratory EUV research with a compact exposure tool

    Science.gov (United States)

    Brose, Sascha; Danylyuk, Serhiy; Tempeler, Jenny; Kim, Hyun-su; Loosen, Peter; Juschkin, Larissa

    2016-03-01

    In this work we present the capabilities of the designed and realized extreme ultraviolet laboratory exposure tool (EUVLET) which has been developed at the RWTH-Aachen, Chair for the Technology of Optical Systems (TOS), in cooperation with the Fraunhofer Institute for Laser Technology (ILT) and Bruker ASC GmbH. Main purpose of this laboratory setup is the direct application in research facilities and companies with small batch production, where the fabrication of high resolution periodic arrays over large areas is required. The setup can also be utilized for resist characterization and evaluation of its pre- and post-exposure processing. The tool utilizes a partially coherent discharge produced plasma (DPP) source and minimizes the number of other critical components to a transmission grating, the photoresist coated wafer and the positioning system for wafer and grating and utilizes the Talbot lithography approach. To identify the limits of this approach first each component is analyzed and optimized separately and relations between these components are identified. The EUV source has been optimized to achieve the best values for spatial and temporal coherence. Phase-shifting and amplitude transmission gratings have been fabricated and exposed. Several commercially available electron beam resists and one EUV resist have been characterized by open frame exposures to determine their contrast under EUV radiation. Cold development procedure has been performed to further increase the resist contrast. By analyzing the exposure results it can be demonstrated that only a 1:1 copy of the mask structure can be fully resolved by the utilization of amplitude masks. The utilized phase-shift masks offer higher 1st order diffraction efficiency and allow a demagnification of the mask structure in the achromatic Talbot plane.

  13. Microwave, EUV, and X-ray observations of active region loops and filaments

    International Nuclear Information System (INIS)

    Schmahl, E.

    1980-01-01

    Until the advent of X-ray and EUV observations of coronal structures, radio observers were forced to rely on eclipse and coronagraph observations in white light and forbidden coronal lines for additional diagnostics of the high temperature microwave sources. While these data provided enough material for theoretical insight into the physics of active regions, there was no way to make direct, simultaneous comparison of coronal structures on the disk as seen at microwave and optical wavelengths. This is now possible, and therefore the author summarizes the EUV and X-ray observations indicating at each point the relevance to microwaves. (Auth.)

  14. Review on the solar spectral variability in the EUV for space weather purposes

    Directory of Open Access Journals (Sweden)

    J. Lilensten

    2008-02-01

    Full Text Available The solar XUV-EUV flux is the main energy source in the terrestrial diurnal thermosphere: it produces ionization, dissociation, excitation and heating. Accurate knowledge of this flux is of prime importance for space weather. We first list the space weather applications that require nowcasting and forecasting of the solar XUV-EUV flux. We then review present models and discuss how they account for the variability of the solar spectrum. We show why the measurement of the full spectrum is difficult, and why it is illusory to retrieve it from its atmospheric effects. We then address the problem of determining a set of observations that are adapted for space weather purposes, in the frame of ionospheric studies. Finally, we review the existing and future space experiments that are devoted to the observation of the solar XUV-EUV spectrum.

  15. EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development.

    Science.gov (United States)

    Gaballah, A E H; Nicolosi, P; Ahmed, Nadeem; Jimenez, K; Pettinari, G; Gerardino, A; Zuppella, P

    2018-01-01

    The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.

  16. Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

    Science.gov (United States)

    Huang, Qiushi; Medvedev, Viacheslav; van de Kruijs, Robbert; Yakshin, Andrey; Louis, Eric; Bijkerk, Fred

    2017-03-01

    Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement

  17. A New Relationship Between Soft X-Rays and EUV Flare Light Curves

    Science.gov (United States)

    Thiemann, Edward

    2016-05-01

    Solar flares are the result of magnetic reconnection in the solar corona which converts magnetic energy into kinetic energy resulting in the rapid heating of solar plasma. As this plasma cools, it emits radiation at different EUV wavelengths when the dropping temperature passes a line’s temperature of formation. This results in a delay in the emissions from cooler EUV lines relative to hotter EUV lines. Therefore, characterizing how this hot plasma cools is important for understanding how the corresponding geo-effective extreme ultraviolet (EUV) irradiance evolves in time. I present a simple new framework in which to study flare cooling by using a Lumped Element Thermal Model (LETM). LETM is frequently used in science and engineering to simplify a complex multi-dimensional thermal system by reducing it to a 0-D thermal circuit. For example, a structure that conducts heat out of a system is simplified with a resistive element and a structure that allows a system to store heat is simplified with a capacitive element. A major advantage of LETM is that the specific geometry of a system can be ignored, allowing for an intuitive analysis of the major thermal processes. I show that LETM is able to accurately reproduce the temporal evolution of cooler flare emission lines based on hotter emission line evolution. In particular, it can be used to predict the evolution of EUV flare light curves using the NOAA X-Ray Sensor (XRS).

  18. Registration performance on EUV masks using high-resolution registration metrology

    Science.gov (United States)

    Steinert, Steffen; Solowan, Hans-Michael; Park, Jinback; Han, Hakseung; Beyer, Dirk; Scherübl, Thomas

    2016-10-01

    Next-generation lithography based on EUV continues to move forward to high-volume manufacturing. Given the technical challenges and the throughput concerns a hybrid approach with 193 nm immersion lithography is expected, at least in the initial state. Due to the increasing complexity at smaller nodes a multitude of different masks, both DUV (193 nm) and EUV (13.5 nm) reticles, will then be required in the lithography process-flow. The individual registration of each mask and the resulting overlay error are of crucial importance in order to ensure proper functionality of the chips. While registration and overlay metrology on DUV masks has been the standard for decades, this has yet to be demonstrated on EUV masks. Past generations of mask registration tools were not necessarily limited in their tool stability, but in their resolution capabilities. The scope of this work is an image placement investigation of high-end EUV masks together with a registration and resolution performance qualification. For this we employ a new generation registration metrology system embedded in a production environment for full-spec EUV masks. This paper presents excellent registration performance not only on standard overlay markers but also on more sophisticated e-beam calibration patterns.

  19. Oxidation and metal contamination of EUV optics

    NARCIS (Netherlands)

    Sturm, Jacobus Marinus; Liu, Feng; Pachecka, Malgorzata; Lee, Christopher James; Bijkerk, Frederik

    2013-01-01

    The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) for printing smaller features on chips. One of the hallenges is to optimally control the contamination of the multilayer mirrors used in the imaging system. The aim of this project is generating fundamental understanding

  20. Objective for EUV microscopy, EUV lithography, and x-ray imaging

    Science.gov (United States)

    Bitter, Manfred; Hill, Kenneth W.; Efthimion, Philip

    2016-05-03

    Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.

  1. Well-defined EUV wave associated with a CME-driven shock

    Science.gov (United States)

    Cunha-Silva, R. D.; Selhorst, C. L.; Fernandes, F. C. R.; Oliveira e Silva, A. J.

    2018-05-01

    Aims: We report on a well-defined EUV wave observed by the Extreme Ultraviolet Imager (EUVI) on board the Solar Terrestrial Relations Observatory (STEREO) and the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory (SDO). The event was accompanied by a shock wave driven by a halo CME observed by the Large Angle and Spectrometric Coronagraph (LASCO-C2/C3) on board the Solar and Heliospheric Observatory (SOHO), as evidenced by the occurrence of type II bursts in the metric and dekameter-hectometric wavelength ranges. We investigated the kinematics of the EUV wave front and the radio source with the purpose of verifying the association between the EUV wave and the shock wave. Methods: The EUV wave fronts were determined from the SDO/AIA images by means of two appropriate directions (slices). The heights (radial propagation) of the EUV wave observed by STEREO/EUVI and of the radio source associated with the shock wave were compared considering the whole bandwidth of the harmonic lane of the radio emission, whereas the speed of the shock was estimated using the lowest frequencies of the harmonic lane associated with the undisturbed corona, using an appropriate multiple of the Newkirk (1961, ApJ, 133, 983) density model and taking into account the H/F frequency ratio fH/fF = 2. The speed of the radio source associated with the interplanetary shock was determined using the Mann et al. (1999, A&A, 348, 614) density model. Results: The EUV wave fronts determined from the SDO/AIA images revealed the coexistence of two types of EUV waves, a fast one with a speed of 560 km s-1, and a slower one with a speed of 250 km s-1, which corresponds approximately to one-third of the average speed of the radio source ( 680 km s-1). The radio signature of the interplanetary shock revealed an almost constant speed of 930 km s-1, consistent with the linear speed of the halo CME (950 km s-1) and with the values found for the accelerating coronal shock ( 535-823 km s-1

  2. Integral characteristics of spectra of ions important for EUV lithography

    International Nuclear Information System (INIS)

    Karazija, R; Kucas, S; Momkauskaite, A

    2006-01-01

    The emission spectrum corresponding to the 4p 5 4d N+1 + 4p 6 4d N-1 4f → 4p 6 4d N transition array is concentrated in a narrow interval of wavelengths. That is due to the existence of an approximate selection rule and quenching of some lines by configuration mixing. Thus such emission of elements near Z = 50 is considered to be the main candidate for the EUV lithography source at λ = 13.5 nm. In the present work the regularities of these transition arrays are considered using their integral characteristics: average energy, total line strength, variance and interval of array containing some part of the total transition probability. Calculations for various ions of elements In, Sn, Sb, Te, I and Xe have been performed in a two-configuration pseudorelativistic approximation, which describes fairly well the main features of the spectra. The variation in the values of the main integral characteristics of the spectra with atomic number and ionization degree gives the possibility of comparing quantitatively the suitability of the emission of various ions for EUV lithography

  3. Optimized qualification protocol on particle cleanliness for EUV mask infrastructure

    Science.gov (United States)

    van der Donck, J. C. J.; Stortelder, J. K.; Derksen, G. B.

    2011-11-01

    With the market introduction of the NXE:3100, Extreme Ultra Violet Lithography (EUVL) enters a new stage. Now infrastructure in the wafer fabs must be prepared for new processes and new materials. Especially the infrastructure for masks poses a challenge. Because of the absence of a pellicle reticle front sides are exceptionally vulnerable to particles. It was also shown that particles on the backside of a reticle may cause tool down time. These effects set extreme requirements to the cleanliness level of the fab infrastructure for EUV masks. The cost of EUV masks justifies the use of equipment that is qualified on particle cleanliness. Until now equipment qualification on particle cleanliness have not been carried out with statistically based qualification procedures. Since we are dealing with extreme clean equipment the number of observed particles is expected to be very low. These particle levels can only be measured by repetitively cycling a mask substrate in the equipment. Recent work in the EUV AD-tool presents data on added particles during load/unload cycles, reported as number of Particles per Reticle Pass (PRP). In the interpretation of the data, variation by deposition statistics is not taken into account. In measurements with low numbers of added particles the standard deviation in PRP number can be large. An additional issue is that particles which are added in the routing outside the equipment may have a large impact on the testing result. The number mismatch between a single handling step outside the tool and the multiple cycling in the equipment makes accuracy of measurements rather complex. The low number of expected particles, the large variation in results and the combined effect of added particles inside and outside the equipment justifies putting good effort in making a test plan. Without a proper statistical background, tests may not be suitable for proving that equipment qualifies for the limiting cleanliness levels. Other risks are that a

  4. Plasma control for efficient extreme ultra-violet source

    International Nuclear Information System (INIS)

    Takahashi, Kensaku; Nakajima, Mitsuo; Kawamura, Tohru; Shiho, Makoto; Hotta, Eiki; Horioka, Kazuhiko

    2008-01-01

    To generate a high efficiency extreme-ultraviolet (EUV) source, effects of plasma shape for controlling radiative plasmas based on xenon capillary discharge are experimentally investigated. The radiation characteristics observed via tapered capillary discharge are compared with those of straight one. From the comparison, the long emission period and different plasma behaviors of tapered capillary discharge are confirmed. This means that control of the plasma geometry is effective for prolonging the EUV emission period. This result also indicates that the plasma shape control seems to have a potential for enhancing the conversion efficiency. (author)

  5. EUV-angle resolved scatter (EUV-ARS): a new tool for the characterization of nanometre structures

    Science.gov (United States)

    Fernández Herrero, Analía.; Mentzel, Heiko; Soltwisch, Victor; Jaroslawzew, Sina; Laubis, Christian; Scholze, Frank

    2018-03-01

    The advance of the semiconductor industry requires new metrology methods, which can deal with smaller and more complex nanostructures. Particularly for inline metrology a rapid, sensitive and non destructive method is needed. Small angle X-ray scattering under grazing incidence has already been investigated for this application and delivers significant statistical information which tracks the profile parameters as well as their variations, i.e. roughness. However, it suffers from the elongated footprint at the sample. The advantage of EUV radiation, with its longer wavelengths, is that larger incidence angles can be used, resulting in a significant reduction of the beam footprint. Targets with field sizes of 100 μm and smaller are accessible with our experimental set-up. We present a new experimental tool for the measurement of small structures based on the capabilities of soft X-ray and EUV scatterometry at the PTB soft X-ray beamline at the electron storage ring BESSY II. PTB's soft X-ray radiometry beamline uses a plane grating monochromator, which covers the spectral range from 0.7 nm to 25 nm and was especially designed to provide highly collimated radiation. An area detector covers the scattered radiation from a grazing exit angle up to an angle of 30° above the sample horizon and the fluorescence emission can be detected with an energy dispersive X-ray silicon drift detector. In addition, the sample can be rotated and linearly moved in vacuum. This new set-up will be used to explore the capabilities of EUV-scatterometry for the characterization of nanometre-sized structures.

  6. EUV microexposures at the ALS using the 0.3-NA MET projection optics

    International Nuclear Information System (INIS)

    Naulleau, Patrick; Goldberg, Kenneth A.; Anderson, Erik; Cain, Jason P.; Denham, Paul; Hoef, Brian; Jackson, Keith; Morlens, Anne-Sophie; Rekawa, Seno; Dean, Kim

    2005-01-01

    The recent development of high numerical aperture (NA) EUV optics such as the 0.3-NA Micro Exposure Tool (MET) optic has given rise to a new class of ultra-high resolution microexposure stations. Once such printing station has been developed and implemented at Lawrence Berkeley National Laboratory's Advanced Light Source. This flexible printing station utilizes a programmable coherence illuminator providing real-time pupil-fill control for advanced EUV resist and mask development. The Berkeley exposure system programmable illuminator enables several unique capabilities. Using dipole illumination out to σ=1, the Berkeley tool supports equal-line-space printing down to 12 nm, well beyond the capabilities of similar tools. Using small-sigma illumination combined with the central obscuration of the MET optic enables the system to print feature sizes that are twice as small as those coded on the mask. In this configuration, the effective 10x-demagnification for equal lines and spaces reduces the mask fabrication burden for ultra-high-resolution printing. The illuminator facilitates coherence studies such as the impact of coherence on line-edge roughness (LER) and flare. Finally the illuminator enables novel print-based aberration monitoring techniques as described elsewhere in these proceedings. Here we describe the capabilities of the new MET printing station and present system characterization results. Moreover, we present the latest printing results obtained in experimental resists. Limited by the availability of high-resolution photoresists, equal line-space printing down to 25 nm has been demonstrated as well as isolated line printing down to 29 nm with an LER of approaching 3 nm

  7. Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

    Science.gov (United States)

    Malinowski, Michael E.; Grunow, Philip A.; Steinhaus, Chip; Clift, W. Miles; Klebanoff, Leonard E.

    2001-08-01

    Carbon deposition and removal experiments on Mo/Si multilayer mirror (MLM) samples were performed using extreme ultraviolet (EUV) light on Beamline 12.0.1.2 of the Advanced Light Source, Lawrence Berkeley National Laboratory (LBNL). Carbon (C) was deposited onto Mo/Si multilayer mirror (MLM) samples when hydrocarbon vapors where intentionally introduced into the MLM test chamber in the presence of EUV at 13.44 nm (92.3eV). The carbon deposits so formed were removed by molecular oxygen + EUV. The MLM reflectivities and photoemission were measured in-situ during these carbon deposition and cleaning procedures. Auger Electron Spectroscopy (AES) sputter-through profiling of the samples was performed after experimental runs to help determine C layer thickness and the near-surface compositional-depth profiles of all samples studied. EUV powers were varied from ~0.2mW/mm2 to 3mW/mm2(at 13.44 nm) during both deposition and cleaning experiments and the oxygen pressure ranged from ~5x10-5 to 5x10-4 Torr during the cleaning experiments. C deposition rates as high as ~8nm/hr were observed, while cleaning rates as high as ~5nm/hr could be achieved when the highest oxygen pressure were used. A limited set of experiments involving intentional oxygen-only exposure of the MLM samples showed that slow oxidation of the MLM surface could occur.

  8. Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

    NARCIS (Netherlands)

    Huang, Qiushi; Medvedev, Viacheslav; van de Kruijs, Robbert Wilhelmus Elisabeth; Yakshin, Andrey; Louis, Eric; Bijkerk, Frederik

    2017-01-01

    Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV

  9. Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography

    Science.gov (United States)

    Buitrago, Elizabeth; Nagahara, Seiji; Yildirim, Oktay; Nakagawa, Hisashi; Tagawa, Seiichi; Meeuwissen, Marieke; Nagai, Tomoki; Naruoka, Takehiko; Verspaget, Coen; Hoefnagels, Rik; Rispens, Gijsbert; Shiraishi, Gosuke; Terashita, Yuichi; Minekawa, Yukie; Yoshihara, Kosuke; Oshima, Akihiro; Vockenhuber, Michaela; Ekinci, Yasin

    2016-03-01

    Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) is the most promising candidate to manufacture electronic devices for future technology nodes in the semiconductor industry. Nonetheless, EUVL still faces many technological challenges as it moves toward high-volume manufacturing (HVM). A key bottleneck from the tool design and performance point of view has been the development of an efficient, high power EUV light source for high throughput production. Consequently, there has been extensive research on different methodologies to enhance EUV resist sensitivity. Resist performance is measured in terms of its ultimate printing resolution, line width roughness (LWR), sensitivity (S or best energy BE) and exposure latitude (EL). However, there are well-known fundamental trade-off relationships (LRS trade-off) among these parameters for chemically amplified resists (CARs). Here we present early proof-of-principle results for a multi-exposure lithography process that has the potential for high sensitivity enhancement without compromising other important performance characteristics by the use of a Photosensitized Chemically Amplified Resist (PSCAR). With this method, we seek to increase the sensitivity by combining a first EUV pattern exposure with a second UV flood exposure (λ = 365 nm) and the use of a PSCAR. In addition, we have evaluated over 50 different state-of-the-art EUV CARs. Among these, we have identified several promising candidates that simultaneously meet sensitivity, LWR and EL high performance requirements with the aim of resolving line space (L/S) features for the 7 and 5 nm logic node (16 nm and 13 nm half-pitch HP, respectively) for HVM. Several CARs were additionally found to be well resolved down to 12 nm and 11 nm HP with minimal pattern collapse and bridging, a remarkable feat for CARs. Finally, the performance of two negative tone state-of-the-art alternative resist platforms previously investigated was compared to the CAR performance at and

  10. Highly Stable, Large Format EUV Imager, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — Higher detection efficiency and better radiation tolerance imagers are needed for the next generation of EUV instruments. Previously, CCD technology has demonstrated...

  11. EUV-VUV photochemistry in the upper atmospheres of Titan and the early Earth

    Science.gov (United States)

    Imanaka, H.; Smith, M. A.

    2010-12-01

    Titan, the organic-rich moon of Saturn, possesses a thick atmosphere of nitrogen, globally covered with organic haze layers. The recent Cassini’s INMS and CAPS observations clearly demonstrate the importance of complex organic chemistry in the ionosphere. EUV photon radiation is the major driving energy source there. Our previous laboratory study of the EUV-VUV photolysis of N2/CH4 gas mixtures demonstrates a unique role of nitrogen photoionization in the catalytic formation of complex hydrocarbons in Titan’s upper atmosphere (Imanaka and Smith, 2007, 2009). Such EUV photochemistry could also have played important roles in the formation of complex organic molecules in the ionosphere of the early Earth. It has been suggested that the early Earth atmosphere may have contained significant amount of reduced species (CH4, H2, and CO) (Kasting, 1990, Pavlov et al., 2001, Tian et al., 2005). Recent experimental study, using photon radiation at wavelengths longer than 110 nm, demonstrates that photochemical organic haze could have been generated from N2/CO2 atmospheres with trace amounts of CH4 or H2 (Trainer et al., 2006, Dewitt et al., 2009). However, possible EUV photochemical processes in the ionosphere are not well understood. We have investigated the effect of CO2 in the possible EUV photochemical processes in simulated reduced early Earth atmospheres. The EUV-VUV photochemistry using wavelength-tunable synchrotron light between 50 - 150 nm was investigated for gas mixtures of 13CO2/CH4 (= 96.7/3.3) and N2/13CO2/CH4 (= 90/6.7/3.3). The onsets of unsaturated hydrocarbon formation were observed at wavelengths shorter than the ionization potentials of CO2 and N2, respectively. This correlation indicates that CO2 can play a similar catalytic role to N2 in the formation of heavy organic species, which implies that EUV photochemistry might have significant impact on the photochemical generation of organic haze layers in the upper atmosphere of the early Earth.

  12. Evaluation of EUV resist performance using interference lithography

    Science.gov (United States)

    Buitrago, E.; Yildirim, O.; Verspaget, C.; Tsugama, N.; Hoefnagels, R.; Rispens, G.; Ekinci, Y.

    2015-03-01

    Extreme ultraviolet lithography (EUVL) stands as the most promising solution for the fabrication of future technology nodes in the semiconductor industry. Nonetheless, the successful introduction of EUVL into the extremely competitive and stringent high-volume manufacturing (HVM) phase remains uncertain partly because of the still limiting performance of EUV resists below 16 nm half-pitch (HP) resolution. Particularly, there exists a trade-off relationship between resolution (half-pitch), sensitivity (dose) and line-edge roughness (LER) that can be achieved with existing materials. This trade-off ultimately hampers their performance and extendibility towards future technology nodes. Here we present a comparative study of highly promising chemically amplified resists (CARs) that have been evaluated using the EUV interference lithography (EUV-IL) tool at the Swiss Light Source (SLS) synchrotron facility in the Paul Scherrer Institute (PSI). In this study we have focused on the performance qualification of different resists mainly for 18 nm and 16 nm half-pitch line/space resolution (L/S = 1:1). Among the most promising candidates tested, there are a few choices that allow for 16 nm HP resolution to be achieved with high exposure latitude (up to ~ 33%), low LER (down to 3.3 nm or ~ 20% of critical dimension CD) and low dose-to-size (or best-energy, BE) < 41 mJ/cm2 values. Patterning was even demonstrated down to 12 nm HP with one of CARs (R1UL1) evaluated for their extendibility beyond the 16 nm HP resolution. 11 nm HP patterning with some pattern collapse and well resolved patterns down 12 nm were also demonstrated with another CAR (R15UL1) formulated for 16 nm HP resolution and below. With such resist it was possible even to obtain a small process window for 14 nm HP processing with an EL ~ 8% (BE ~ 37 mJ/cm2, LER ~ 4.5 nm). Though encouraging, fulfilling all of the requirements necessary for high volume production, such as high resolution, low LER, high photon

  13. MAVEN EUV Modelled Data Bundle

    Data.gov (United States)

    National Aeronautics and Space Administration — This bundle contains solar irradiance spectra in 1-nm bins from 0-190 nm. The spectra are generated based upon the Flare Irradiance Spectra Model - Mars (FISM-M)...

  14. ROSAT EUV and soft X-ray studies of atmospheric composition and structure in G191-B2B

    Science.gov (United States)

    Barstow, M. A.; Fleming, T. A.; Finley, D. S.; Koester, D.; Diamond, C. J.

    1993-01-01

    Previous studies of the hot DA white dwarf GI91-B2B have been unable to determine whether the observed soft X-ray and EUV opacity arises from a stratified hydrogen and helium atmosphere or from the presence of trace metals in the photosphere. New EUV and soft X-ray photometry of this star, made with the ROSAT observatory, when analyzed in conjunction with the earlier data, shows that the stratified models cannot account for the observed fluxes. Consequently, we conclude that trace metals must be a substantial source of opacity in the photosphere of G191-B2B.

  15. Measurements of EUV coronal holes and open magnetic flux

    International Nuclear Information System (INIS)

    Lowder, C.; Qiu, J.; Leamon, R.; Liu, Y.

    2014-01-01

    Coronal holes are regions on the Sun's surface that map the footprints of open magnetic field lines. We have developed an automated routine to detect and track boundaries of long-lived coronal holes using full-disk extreme-ultraviolet (EUV) images obtained by SOHO/EIT, SDO/AIA, and STEREO/EUVI. We measure coronal hole areas and magnetic flux in these holes, and compare the measurements with calculations by the potential field source surface (PFSS) model. It is shown that, from 1996 through 2010, the total area of coronal holes measured with EIT images varies between 5% and 17% of the total solar surface area, and the total unsigned open flux varies between (2-5)× 10 22 Mx. The solar cycle dependence of these measurements is similar to the PFSS results, but the model yields larger hole areas and greater open flux than observed by EIT. The AIA/EUVI measurements from 2010-2013 show coronal hole area coverage of 5%-10% of the total surface area, with significant contribution from low latitudes, which is under-represented by EIT. AIA/EUVI have measured much enhanced open magnetic flux in the range of (2-4)× 10 22 Mx, which is about twice the flux measured by EIT, and matches with the PFSS calculated open flux, with discrepancies in the location and strength of coronal holes. A detailed comparison between the three measurements (by EIT, AIA-EUVI, and PFSS) indicates that coronal holes in low latitudes contribute significantly to the total open magnetic flux. These low-latitude coronal holes are not well measured with either the He I 10830 line in previous studies, or EIT EUV images; neither are they well captured by the static PFSS model. The enhanced observations from AIA/EUVI allow a more accurate measure of these low-latitude coronal holes and their contribution to open magnetic flux.

  16. Measurements of EUV coronal holes and open magnetic flux

    Energy Technology Data Exchange (ETDEWEB)

    Lowder, C.; Qiu, J.; Leamon, R. [Department of Physics, Montana State University, Bozeman, MT 59717 (United States); Liu, Y., E-mail: clowder@solar.physics.montana.edu [W. W. Hansen Experimental Physics Laboratory, Stanford University, Stanford, CA 94305 (United States)

    2014-03-10

    Coronal holes are regions on the Sun's surface that map the footprints of open magnetic field lines. We have developed an automated routine to detect and track boundaries of long-lived coronal holes using full-disk extreme-ultraviolet (EUV) images obtained by SOHO/EIT, SDO/AIA, and STEREO/EUVI. We measure coronal hole areas and magnetic flux in these holes, and compare the measurements with calculations by the potential field source surface (PFSS) model. It is shown that, from 1996 through 2010, the total area of coronal holes measured with EIT images varies between 5% and 17% of the total solar surface area, and the total unsigned open flux varies between (2-5)× 10{sup 22} Mx. The solar cycle dependence of these measurements is similar to the PFSS results, but the model yields larger hole areas and greater open flux than observed by EIT. The AIA/EUVI measurements from 2010-2013 show coronal hole area coverage of 5%-10% of the total surface area, with significant contribution from low latitudes, which is under-represented by EIT. AIA/EUVI have measured much enhanced open magnetic flux in the range of (2-4)× 10{sup 22} Mx, which is about twice the flux measured by EIT, and matches with the PFSS calculated open flux, with discrepancies in the location and strength of coronal holes. A detailed comparison between the three measurements (by EIT, AIA-EUVI, and PFSS) indicates that coronal holes in low latitudes contribute significantly to the total open magnetic flux. These low-latitude coronal holes are not well measured with either the He I 10830 line in previous studies, or EIT EUV images; neither are they well captured by the static PFSS model. The enhanced observations from AIA/EUVI allow a more accurate measure of these low-latitude coronal holes and their contribution to open magnetic flux.

  17. Detecting EUV transients in near real time with ALEXIS

    Energy Technology Data Exchange (ETDEWEB)

    Roussel-Dupre`, D.; Bloch, J.J.; Theiler, J.; Pfafman, T.; Beauchesne, B.

    1995-12-31

    The Array of Low Energy X-ray Imaging Sensors (ALEXIS) experiment consists of a mini-satellite containing six wide angle EUV/ultrasoft X-ray telescopes (Priedhorsky et al. 1989, and Bloch et al. 1994). Its scientific objective is to map out the sky in three narrow ({Delta}E/E {approx} 5%) bandpasses around 66, 71, and 93 eV. During each 50 second satellite rotation period the six telescopes, each with a 30{degrees} field, of:view and a spatial resolution of 0.25{degrees}, scan most of the antisolar hemisphere of the sky. The project is a collaborative effort between Los Alamos National Laboratory, Sandia National Laboratory, and the University of California-Berkeley Space Sciences Laboratory. It is controlled entirely from a small ground station located at Los Alamos. The mission was launched on a Pegasus Air Launched Vehicle on April 25, 1993. An incident at launch delayed our ability to properly analyze the data until November of 1994. In January of 1995, we brought on line automated software to routinely carry out the transient search. After the data is downlinked from the satellite, the software processes and transforms it into sky maps that are automatically searched for new sources. The software then sends the results of these searches by e-mail to the science team within two hours of the downlink. This system has successfully detected the Cataclysmic Variables VW Hyi, U Gem and AR UMa in outburst, and has detected at least two unidentified short duration EUV transients (Roussel-Dupre et al 1995, Roussel-Dupre 1995).

  18. Novel EUV photoresist for sub-7nm node (Conference Presentation)

    Science.gov (United States)

    Furukawa, Tsuyoshi; Naruoka, Takehiko; Nakagawa, Hisashi; Miyata, Hiromu; Shiratani, Motohiro; Hori, Masafumi; Dei, Satoshi; Ayothi, Ramakrishnan; Hishiro, Yoshi; Nagai, Tomoki

    2017-04-01

    Extreme ultraviolet (EUV) lithography has been recognized as a promising candidate for the manufacturing of semiconductor devices as LS and CH pattern for 7nm node and beyond. EUV lithography is ready for high volume manufacturing stage. For the high volume manufacturing of semiconductor devices, significant improvement of sensitivity and line edge roughness (LWR) and Local CD Uniformity (LCDU) is required for EUV resist. It is well-known that the key challenge for EUV resist is the simultaneous requirement of ultrahigh resolution (R), low line edge roughness (L) and high sensitivity (S). Especially high sensitivity and good roughness is important for EUV lithography high volume manufacturing. We are trying to improve sensitivity and LWR/LCDU from many directions. From material side, we found that both sensitivity and LWR/LCDU are simultaneously improved by controlling acid diffusion length and efficiency of acid generation using novel resin and PAG. And optimizing EUV integration is one of the good solution to improve sensitivity and LWR/LCDU. We are challenging to develop new multi-layer materials to improve sensitivity and LWR/LCDU. Our new multi-layer materials are designed for best performance in EUV lithography system. From process side, we found that sensitivity was substantially improved maintaining LWR applying novel type of chemical amplified resist (CAR) and process. EUV lithography evaluation results obtained for new CAR EUV interference lithography. And also metal containing resist is one possibility to break through sensitivity and LWR trade off. In this paper, we will report the recent progress of sensitivity and LWR/LCDU improvement of JSR novel EUV resist and process.

  19. EUV mask manufacturing readiness in the merchant mask industry

    Science.gov (United States)

    Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

    2017-10-01

    As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for

  20. Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

    International Nuclear Information System (INIS)

    Hill, S B; Ermanoski, I; Tarrio, C; Lucatorto, T B; Madey, T E; Bajt, S; Fang, M; Chandhok, M

    2007-01-01

    Ongoing endurance testing of Ru-capped multilayer mirrors (MLMs) at the NIST synchrotron facility has revealed that the damage resulting from EUV irradiation does not always depend on the exposure conditions in an intuitive way. Previous exposures of Ru-capped MLMs to EUV radiation in the presence of water vapor demonstrated that the mirror damage rate actually decreases with increasing water pressure. We will present results of recent exposures showing that the reduction in damage for partial pressures of water up to 5 x 10 -6 Torr is not the result of a spatially uniform decrease in damage across the Gaussian intensity distribution of the incident EUV beam. Instead we observe a drop in the damage rate in the center of the exposure spot where the intensity is greatest, while the reflectivity loss in the wings of the intensity distribution appears to be independent of water partial pressure. (See Fig. 1.) We will discuss how the overall damage rate and spatial profile can be influenced by admixtures of carbon-containing species (e.g., CO, CO 2 , C 6 H 6 ) at partial pressures one-to-two orders of magnitude lower than the water vapor partial pressure. An investigation is underway to find the cause of the non-Gaussian damage profile. Preliminary results and hypotheses will be discussed. In addition to high-resolution reflectometry of the EUV-exposure sites, the results of surface analysis such as XPS will be presented. We will also discuss how the bandwidth and time structure of incident EUV radiation may affect the rate of reflectivity degradation. Although the observations presented here are based on exposures of Ru-capped MLMs, unless novel capping layers are similarly characterized, direct application of accelerated testing results could significantly overestimate mirror lifetime in the production environment

  1. An Open-Source Based ITS Platform

    DEFF Research Database (Denmark)

    Andersen, Ove; Krogh, Benjamin Bjerre; Torp, Kristian

    2013-01-01

    In this paper, a complete platform used to compute travel times from GPS data is described. Two approaches to computing travel time are proposed one based on points and one based on trips. Overall both approaches give reasonable results compared to existing manual estimated travel times. However......, the trip-based approach requires more GPS data and of a higher quality than the point-based approach. The platform has been completely implemented using open-source software. The main conclusion is that large quantity of GPS data can be managed, with a limited budget and that GPS data is a good source...... for estimating travel times, if enough data is available....

  2. An accelerator based steady state neutron source

    International Nuclear Information System (INIS)

    Burke, R.J.; Johnson, D.L.

    1985-01-01

    Using high current, c.w. linear accelerator technology, a spallation neutron source can achieve much higher average intensities than existing or proposed pulsed spallation sources. With about 100 mA of 300 MeV protons or deuterons, the Accelerator Based Neutron Research Facility (ABNR) would initially achieve the 10 16 n/cm 2 .s thermal flux goal of the advanced steady state neutron source, and upgrading could provide higher steady state fluxes. The relatively low ion energy compared to other spallation sources has an important impact on R and D requirements as well as capital cost, for which a range of $300-450M is estimated by comparison to other accelerator-based neutron source facilities. The source is similar to a reactor source in most respects. It has some higher energy neutrons but fewer gamma rays, and the moderator region is free of many of the design constraints of a reactor, which helps to implement sources for various neutron energy spectra, many beam tubes, etc. With the development of multi-beam concept and the basis for currents greater than 100 mA that is assumed in the R and D plan, the ABNR would serve many additional uses, such as fusion materials development, production of proton-rich isotopes, and other energy and defense program needs

  3. Embedded top-coat for reducing the effect out of band radiation in EUV lithography

    Science.gov (United States)

    Du, Ke; Siauw, Meiliana; Valade, David; Jasieniak, Marek; Voelcker, Nico; Trefonas, Peter; Thackeray, Jim; Blakey, Idriss; Whittaker, Andrew

    2017-03-01

    Out of band (OOB) radiation from the EUV source has significant implications for the performance of EUVL photoresists. Here we introduce a surface-active polymer additive, capable of partitioning to the top of the resist film during casting and annealing, to protect the underlying photoresist from OOB radiation. Copolymers were prepared using reversible addition-fragmentation chain transfer (RAFT) polymerization, and rendered surface active by chain extension with a block of fluoro-monomer. Films were prepared from the EUV resist with added surface-active Embedded Barrier Layer (EBL), and characterized using measurements of contact angles and spectroscopic ellipsometry. Finally, the lithographic performance of the resist containing the EBL was evaluated using Electron Beam Lithography exposure

  4. Plasma Surface Interactions Common to Advanced Fusion Wall Materials and EUV Lithography - Lithium and Tin

    Science.gov (United States)

    Ruzic, D. N.; Alman, D. A.; Jurczyk, B. E.; Stubbers, R.; Coventry, M. D.; Neumann, M. J.; Olczak, W.; Qiu, H.

    2004-09-01

    Advanced plasma facing components (PFCs) are needed to protect walls in future high power fusion devices. In the semiconductor industry, extreme ultraviolet (EUV) sources are needed for next generation lithography. Lithium and tin are candidate materials in both areas, with liquid Li and Sn plasma material interactions being critical. The Plasma Material Interaction Group at the University of Illinois is leveraging liquid metal experimental and computational facilities to benefit both fields. The Ion surface InterAction eXperiment (IIAX) has measured liquid Li and Sn sputtering, showing an enhancement in erosion with temperature for light ion bombardment. Surface Cleaning of Optics by Plasma Exposure (SCOPE) measures erosion and damage of EUV mirror samples, and tests cleaning recipes with a helicon plasma. The Flowing LIquid surface Retention Experiment (FLIRE) measures the He and H retention in flowing liquid metals, with retention coefficients varying between 0.001 at 500 eV to 0.01 at 4000 eV.

  5. Negative-tone imaging with EUV exposure toward 13nm hp

    Science.gov (United States)

    Tsubaki, Hideaki; Nihashi, Wataru; Tsuchihashi, Toru; Yamamoto, Kei; Goto, Takahiro

    2016-03-01

    Negative-tone imaging (NTI) with EUV exposure has major advantages with respect to line-width roughness (LWR) and resolution due in part to polymer swelling and favorable dissolution mechanics. In NTI process, both resist and organic solvents play important roles in determining lithography performances. The present study describes novel chemically amplified resist materials based on NTI technology with EUV using a specific organic solvents. Lithographic performances of NTI process were described in this paper under exposures using ASML NXE:3300 EUV scanner at imec. It is emphasized that 14 nm hp was nicely resolved under exposure dose of 37 mJ/cm2 without any bridge and collapse, which are attributed to the low swelling character of NTI process. Although 13 nm hp resolution was potentially obtained, a pattern collapse still restricts its resolution in case coating resist film thickness is 40 nm. Dark mask limitation due mainly to mask defectivity issue makes NTI with EUV favorable approach for printing block mask to produce logic circuit. A good resolution of CD-X 21 nm/CD-Y 32 nm was obtained for block mask pattern using NTI with usable process window and dose of 49 mJ/cm2. Minimum resolution now reaches CD-X 17 nm / CD-Y 23 nm for the block. A 21 nm block mask resolution was not affected by exposure dose and explored toward low dose down to 18 mJ/cm2 by reducing quencher loading. In addition, there was a negligible amount of increase in LCDU for isolated dot pattern when decreasing exposure dose from 66 mJ/cm2 to 24 mJ/cm2. On the other hand, there appeared tradeoff relationship between LCDU and dose for dense dot pattern, indicating photon-shot noise restriction, but strong dependency on patterning features. Design to improve acid generation efficiency was described based on acid generation mechanism in traditional chemically amplified materials which contains photo-acid generator (PAG) and polymer. Conventional EUV absorber comprises of organic compounds is

  6. EUV and radio spectrum of coronal holes

    Energy Technology Data Exchange (ETDEWEB)

    Chiuderi Drago, F [Osservatorio Astrofisico di Arcetri, Florence (Italy)

    1980-03-01

    From the intensity of 19 EUV lines whose formation temperature anti T ranges from 3 x 10/sup 4/ to 1.4 x 10/sup 6/, two different models of the transition region and corona for the cell-centre and the network are derived. It is shown that both these models give radio brightness temperatures systematically higher than the observed ones. An agreement with radio data can be found only with lines formed at low temperature (anti T < 8.5 x 10/sup 5/) by decreasing the coronal temperature and the emission measure. The possibility of resolving the discrepancy by using different ion abundances has also been investigated with negative results.

  7. Spectroscopic modeling for tungsten EUV spectra

    International Nuclear Information System (INIS)

    Murakami, Izumi; Kato, Daiji; Sakaue, Hiroyuki A.; Suzuki, Chihiro; Morita, Shigeru; Goto, Motoshi; Sasaki, Akira; Nakamura, Nobuyuki; Yamamoto, Norimasa; Koike, Fumihiro

    2014-01-01

    We have constructed an atomic model for tungsten extreme ultraviolet (EUV) spectra to reconstruct characteristic spectral feature of unresolved transition array (UTA) observed at 4-7 nm for tungsten ions. In the tungsten atomic modeling, we considered fine-structure levels with the quantum principal number n up to 6 as the atomic structure and calculated the electron-impact collision cross sections by relativistic distorted-wave method, using HULLAC atomic code. We measured tungsten EUV spectra in Large Helical Device (LHD) and Compact Electron Beam Ion Trap device (CoBIT) and compared them with the model calculation. The model successfully explain series of emission peaks at 1.5-3.5 nm as n=5-4 and 6-4 transitions of W"2"4"+ - W"3"2"+ measured in CoBIT and LHD and the charge state distributions were estimated for LHD plasma. The UTA feature observed at 4-7 nm was also successfully reconstructed with our model. The peak at ∼5 nm is produced mainly by many 4f-4d transition of W"2"2"+ - W"3"5"+ ions, and the second peak at ∼6 nm is produced by 4f-4d transition of W"2"5"+ - W"2"8"+ ions, and 4d-4p inner-shell transitions, 4p"54d"n"+"1 - 4p"64d"n, of W"2"9"+ - W"3"5"+ ions. These 4d-4p inner-shell transitions become strong since we included higher excited states such as 4p"54d"n4f state, which ADAS atomic data set does not include for spectroscopic modeling with fine structure levels. (author)

  8. Spectroscopic studies of xenon EUV emission in the 40-80 nm wavelength range using an absolutely calibrated monochromator

    Energy Technology Data Exchange (ETDEWEB)

    Merabet, H [Mathematic and Sciences Unit, Dhofar University, Salalah 211, Sultanate of (Oman); Bista, R [Department of Physics, University of Nevada Reno, Reno, NV 89557 (United States); Bruch, R [Department of Physics, University of Nevada Reno, Reno, NV 89557 (United States); Fuelling, S [Department of Physics, University of Nevada Reno, Reno, NV 89557 (United States)

    2007-03-01

    We have measured and identified numerous Extreme UltraViolet (EUV) radiative line structures arising from xenon (Xe) ions in charge state q = 1 to 10 in the wavelength range 40-80 nm. To obtain reasonable intensities of different charged Xe ions, we have used a compact microwave plasma source which was designed and developed at the Lawrence Berkeley National Laboratory (LBNL). The EUV emission of the ECR plasma has been measured by a 1.5 m grazing incidence monochromator that was absolutely calibrated in the 10-80 nm wavelength range using well known and calibrated EUV light at the Advanced Light Source (ALS), LBNL. This calibration has enabled us to determine absolute intensities of previously measured EUV radiative lines in the wavelengths regions investigated for different ionization stages of Xe. In addition, emission spectra of xenon ions for corresponding measured lines have been calculated. The calculations have been carried out within the relativistic Hartree-Fock (HF) approximation. Results of calculations are found to be in good agreement with current and available experimental and theoretical data.

  9. 4-D modeling of CME expansion and EUV dimming observed with STEREO/EUVI

    Directory of Open Access Journals (Sweden)

    M. J. Aschwanden

    2009-08-01

    Full Text Available This is the first attempt to model the kinematics of a CME launch and the resulting EUV dimming quantitatively with a self-consistent model. Our 4-D-model assumes self-similar expansion of a spherical CME geometry that consists of a CME front with density compression and a cavity with density rarefaction, satisfying mass conservation of the total CME and swept-up corona. The model contains 14 free parameters and is fitted to the 25 March 2008 CME event observed with STEREO/A and B. Our model is able to reproduce the observed CME expansion and related EUV dimming during the initial phase from 18:30 UT to 19:00 UT. The CME kinematics can be characterized by a constant acceleration (i.e., a constant magnetic driving force. While the observations of EUVI/A are consistent with a spherical bubble geometry, we detect significant asymmetries and density inhomogeneities with EUVI/B. This new forward-modeling method demonstrates how the observed EUV dimming can be used to model physical parameters of the CME source region, the CME geometry, and CME kinematics.

  10. Nanomaterial-based x-ray sources

    Science.gov (United States)

    Cole, Matthew T.; Parmee, R. J.; Milne, William I.

    2016-02-01

    Following the recent global excitement and investment in the emerging, and rapidly growing, classes of one and two-dimensional nanomaterials, we here present a perspective on one of the viable applications of such materials: field electron emission based x-ray sources. These devices, which have a notable history in medicine, security, industry and research, to date have almost exclusively incorporated thermionic electron sources. Since the middle of the last century, field emission based cathodes were demonstrated, but it is only recently that they have become practicable. We outline some of the technological achievements of the past two decades, and describe a number of the seminal contributions. We explore the foremost market hurdles hindering their roll-out and broader industrial adoption and summarise the recent progress in miniaturised, pulsed and multi-source devices.

  11. Accelerator-based pulsed cold neutron source

    International Nuclear Information System (INIS)

    Inoue, Kazuhiko; Iwasa, Hirokatsu; Kiyanagi, Yoshiaki

    1979-01-01

    An accelerator-based pulsed cold neutron source was constructed. The accelerator is a 35 MeV electron linear accelerator with 1 kW average beam power. The cold neutron beam intensity at a specimen is equivalent to that of a research reactor of 10 14 n/cm 2 .s thermal flux in the case of the quasi-elastic neutron scattering measurements. In spite of some limitations to the universal uses, it has been demonstrated by this facility that the modest capacity accelerator-based pulsed cold neutron source is a highly efficient cold neutron source with low capital investment. Design philosophy, construction details, performance and some operational experiences are described. (author)

  12. First environmental data from the EUV engineering test stand

    Science.gov (United States)

    Klebanoff, Leonard E.; Malinowski, Michael E.; Grunow, Philip A.; Clift, W. Miles; Steinhaus, Chip; Leung, Alvin H.; Haney, Steven J.

    2001-08-01

    The first environmental data from the Engineering Test Stand (ETS) has been collected. Excellent control of high-mass hydrocarbons has been observed. This control is a result of extensive outgas testing of components and materials, vacuum compatible design of the ETS, careful cleaning of parts and pre-baking of cables and sub assemblies where possible, and clean assembly procedures. As a result of the hydrocarbon control, the residual ETS vacuum environment is rich in water vapor. Analysis of witness plate data indicates that the ETS environment does not pose a contamination risk to the optics in the absence of EUV irradiation. However, with EUV exposure, the water rich environment can lead to EUV- induced water oxidation of the Si-terminated Mo/Si optics. Added ethanol can prevent optic oxidation, allowing carbon growth via EUV cracking of low-level residual hydrocarbons to occur. The EUV environmental issues are understood, mitigation approaches have been validated, and EUV optic contamination appears to be manageable.

  13. EUV stimulated emission from MgO pumped by FEL pulses

    Directory of Open Access Journals (Sweden)

    Philippe Jonnard

    2017-09-01

    Full Text Available Stimulated emission is a fundamental process in nature that deserves to be investigated and understood in the extreme ultra-violet (EUV and x-ray regimes. Today, this is definitely possible through high energy density free electron laser (FEL beams. In this context, we give evidence for soft-x-ray stimulated emission from a magnesium oxide solid target pumped by EUV FEL pulses formed in the regime of travelling-wave amplified spontaneous emission in backward geometry. Our results combine two effects separately reported in previous works: emission in a privileged direction and existence of a material-dependent threshold for the stimulated emission. We develop a novel theoretical framework, based on coupled rate and transport equations taking into account the solid-density plasma state of the target. Our model accounts for both observed mechanisms that are the privileged direction for the stimulated emission of the Mg L2,3 characteristic emission and the pumping threshold.

  14. Roughness characterization of EUV multilayer coatings and ultra-smooth surfaces by light scattering

    Science.gov (United States)

    Trost, M.; Schröder, S.; Lin, C. C.; Duparré, A.; Tünnermann, A.

    2012-09-01

    Optical components for the extreme ultraviolet (EUV) face stringent requirements for surface finish, because even small amounts of surface and interface roughness can cause significant scattering losses and impair image quality. In this paper, we investigate the roughness evolution of Mo/Si multilayers by analyzing the scattering behavior at a wavelength of 13.5 nm as well as taking atomic force microscopy (AFM) measurements before and after coating. Furthermore, a new approach to measure substrate roughness is presented, which is based on light scattering measurements at 405 nm. The high robustness and sensitivity to roughness of this method are illustrated using an EUV mask blank with a highspatial frequency roughness of as low as 0.04 nm.

  15. Classification and printability of EUV mask defects from SEM images

    Science.gov (United States)

    Cho, Wonil; Price, Daniel; Morgan, Paul A.; Rost, Daniel; Satake, Masaki; Tolani, Vikram L.

    2017-10-01

    Classification and Printability of EUV Mask Defects from SEM images EUV lithography is starting to show more promise for patterning some critical layers at 5nm technology node and beyond. However, there still are many key technical obstacles to overcome before bringing EUV Lithography into high volume manufacturing (HVM). One of the greatest obstacles is manufacturing defect-free masks. For pattern defect inspections in the mask-shop, cutting-edge 193nm optical inspection tools have been used so far due to lacking any e-beam mask inspection (EBMI) or EUV actinic pattern inspection (API) tools. The main issue with current 193nm inspection tools is the limited resolution for mask dimensions targeted for EUV patterning. The theoretical resolution limit for 193nm mask inspection tools is about 60nm HP on masks, which means that main feature sizes on EUV masks will be well beyond the practical resolution of 193nm inspection tools. Nevertheless, 193nm inspection tools with various illumination conditions that maximize defect sensitivity and/or main-pattern modulation are being explored for initial EUV defect detection. Due to the generally low signal-to-noise in the 193nm inspection imaging at EUV patterning dimensions, these inspections often result in hundreds and thousands of defects which then need to be accurately reviewed and dispositioned. Manually reviewing each defect is difficult due to poor resolution. In addition, the lack of a reliable aerial dispositioning system makes it very challenging to disposition for printability. In this paper, we present the use of SEM images of EUV masks for higher resolution review and disposition of defects. In this approach, most of the defects detected by the 193nm inspection tools are first imaged on a mask SEM tool. These images together with the corresponding post-OPC design clips are provided to KLA-Tencor's Reticle Decision Center (RDC) platform which provides ADC (Automated Defect Classification) and S2A (SEM

  16. Determination of line profiles on nano-structured surfaces using EUV and x-ray scattering

    Science.gov (United States)

    Soltwisch, Victor; Wernecke, Jan; Haase, Anton; Probst, Jürgen; Schoengen, Max; Krumrey, Michael; Scholze, Frank; Pomplun, Jan; Burger, Sven

    2014-09-01

    Non-imaging techniques like X-ray scattering are supposed to play an important role in the further development of CD metrology for the semiconductor industry. Grazing Incidence Small Angle X-ray Scattering (GISAXS) provides directly assessable information on structure roughness and long-range periodic perturbations. The disadvantage of the method is the large footprint of the X-ray beam on the sample due to the extremely shallow angle of incidence. This can be overcome by using wavelengths in the extreme ultraviolet (EUV) spectral range, EUV small angle scattering (EUVSAS), which allows for much steeper angles of incidence but preserves the range of momentum transfer that can be observed. Generally, the potentially higher momentum transfer at shorter wavelengths is counterbalanced by decreasing diffraction efficiency. This results in a practical limit of about 10 nm pitch for which it is possible to observe at least the +/- 1st diffraction orders with reasonable efficiency. At the Physikalisch-Technische Bundesanstalt (PTB), the available photon energy range extends from 50 eV up to 10 keV at two adjacent beamlines. PTB commissioned a new versatile Ellipso-Scatterometer which is capable of measuring 6" square substrates in a clean, hydrocarbon-free environment with full flexibility regarding the direction of the incident light polarization. The reconstruction of line profiles using a geometrical model with six free parameters, based on a finite element method (FEM) Maxwell solver and a particle swarm based least-squares optimization yielded consistent results for EUV-SAS and GISAXS. In this contribution we present scatterometry data for line gratings and consistent reconstruction results of the line geometry for EUV-SAS and GISAXS.

  17. Cyclotron-based neutron source for BNCT

    Energy Technology Data Exchange (ETDEWEB)

    Mitsumoto, T.; Yajima, S.; Tsutsui, H.; Ogasawara, T.; Fujita, K. [Sumitomo Heavy Industries, Ltd (Japan); Tanaka, H.; Sakurai, Y.; Maruhashi, A. [Kyoto University Research Reactor Institute (Japan)

    2013-04-19

    Kyoto University Research Reactor Institute (KURRI) and Sumitomo Heavy Industries, Ltd. (SHI) have developed a cyclotron-based neutron source for Boron Neutron Capture Therapy (BNCT). It was installed at KURRI in Osaka prefecture. The neutron source consists of a proton cyclotron named HM-30, a beam transport system and an irradiation and treatment system. In the cyclotron, H- ions are accelerated and extracted as 30 MeV proton beams of 1 mA. The proton beams is transported to the neutron production target made by a beryllium plate. Emitted neutrons are moderated by lead, iron, aluminum and calcium fluoride. The aperture diameter of neutron collimator is in the range from 100 mm to 250 mm. The peak neutron flux in the water phantom is 1.8 Multiplication-Sign 109 neutrons/cm{sup 2}/sec at 20 mm from the surface at 1 mA proton beam. The neutron source have been stably operated for 3 years with 30 kW proton beam. Various pre-clinical tests including animal tests have been done by using the cyclotron-based neutron source with {sup 10}B-p-Borono-phenylalanine. Clinical trials of malignant brain tumors will be started in this year.

  18. Open Source GIS based integrated watershed management

    Science.gov (United States)

    Byrne, J. M.; Lindsay, J.; Berg, A. A.

    2013-12-01

    Optimal land and water management to address future and current resource stresses and allocation challenges requires the development of state-of-the-art geomatics and hydrological modelling tools. Future hydrological modelling tools should be of high resolution, process based with real-time capability to assess changing resource issues critical to short, medium and long-term enviromental management. The objective here is to merge two renowned, well published resource modeling programs to create an source toolbox for integrated land and water management applications. This work will facilitate a much increased efficiency in land and water resource security, management and planning. Following an 'open-source' philosophy, the tools will be computer platform independent with source code freely available, maximizing knowledge transfer and the global value of the proposed research. The envisioned set of water resource management tools will be housed within 'Whitebox Geospatial Analysis Tools'. Whitebox, is an open-source geographical information system (GIS) developed by Dr. John Lindsay at the University of Guelph. The emphasis of the Whitebox project has been to develop a user-friendly interface for advanced spatial analysis in environmental applications. The plugin architecture of the software is ideal for the tight-integration of spatially distributed models and spatial analysis algorithms such as those contained within the GENESYS suite. Open-source development extends knowledge and technology transfer to a broad range of end-users and builds Canadian capability to address complex resource management problems with better tools and expertise for managers in Canada and around the world. GENESYS (Generate Earth Systems Science input) is an innovative, efficient, high-resolution hydro- and agro-meteorological model for complex terrain watersheds developed under the direction of Dr. James Byrne. GENESYS is an outstanding research and applications tool to address

  19. Stellar and Laboratory XUV/EUV Line Ratios in Fe XVIII and Fe XIX

    Science.gov (United States)

    Träbert, Elmar; Beiersdorfer, P.; Clementson, J.

    2011-09-01

    A so-called XUV excess has been suspected with the relative fluxes of Fe XVIII and Fe XIX lines in XUV and EUV spectra of the star Capella as observed by the Chandra spacecraft [1] when comparing the observations with simulations of stellar spectra based on APEC or FAC. We have addressed this problem by laboratory studies using the Livermore electron beam ion trap (EBIT). Our understanding of the EBIT spectrum is founded on work by Brown et al. [2]. The electron density of the electron beam in an EBIT is compatible to the density in energetic stellar flares. In our experiments, the relative detection efficiencies of two flat-field grating spectrographs operating in the EUV (near 100 Å) and XUV (near 16 Å) ranges have been determined using the calculated branching ratio of 1-3 and 2-3 transition in the H-like spectrum O VIII. FAC calculations assuming several electron beam energies and electron densities serve to correct the EBIT observations for the Maxwellian excitation in a natural plasma. In the EUV, the line intensity pattern predicted by FAC agrees reasonably well with the laboratory and Capella observations. In the XUV wavelength range, agreement of laboratory and astrophysical line intensities is patchy. The spectral simulation results from FAC are much closer to stellar and laboratory observation than those obtained by APEC. Instead of claiming an XUV excess, the XUV/EUV line intensities can be explained by a somewhat higher temperature of Capella than the previously assumed T=6 MK. This work was performed under the auspices of the USDoE by LLNL under Contract DE-AC52-07NA27344 and was supported by the NASA under work order NNH07AF81I issued by the APRA Program. E.T. acknowledges support by DFG Germany. 1. P. Desai et al., ApJ 625, L59 (2005). 2. G. V. Brown et al., ApJS 140, 589 (2002).

  20. A new storage-ring light source

    Energy Technology Data Exchange (ETDEWEB)

    Chao, Alex [SLAC National Accelerator Lab., Menlo Park, CA (United States)

    2015-06-01

    A recently proposed technique in storage ring accelerators is applied to provide potential high-power sources of photon radiation. The technique is based on the steady-state microbunching (SSMB) mechanism. As examples of this application, one may consider a high-power DUV photon source for research in atomic and molecular physics or a high-power EUV radiation source for industrial lithography. A less challenging proof-of-principle test to produce IR radiation using an existing storage ring is also considered.

  1. EUV multilayer defect compensation (MDC) by absorber pattern modification: from theory to wafer validation

    Science.gov (United States)

    Pang, Linyong; Hu, Peter; Satake, Masaki; Tolani, Vikram; Peng, Danping; Li, Ying; Chen, Dongxue

    2011-11-01

    According to the ITRS roadmap, mask defects are among the top technical challenges to introduce extreme ultraviolet (EUV) lithography into production. Making a multilayer defect-free extreme ultraviolet (EUV) blank is not possible today, and is unlikely to happen in the next few years. This means that EUV must work with multilayer defects present on the mask. The method proposed by Luminescent is to compensate effects of multilayer defects on images by modifying the absorber patterns. The effect of a multilayer defect is to distort the images of adjacent absorber patterns. Although the defect cannot be repaired, the images may be restored to their desired targets by changing the absorber patterns. This method was first introduced in our paper at BACUS 2010, which described a simple pixel-based compensation algorithm using a fast multilayer model. The fast model made it possible to complete the compensation calculations in seconds, instead of days or weeks required for rigorous Finite Domain Time Difference (FDTD) simulations. Our SPIE 2011 paper introduced an advanced compensation algorithm using the Level Set Method for 2D absorber patterns. In this paper the method is extended to consider process window, and allow repair tool constraints, such as permitting etching but not deposition. The multilayer defect growth model is also enhanced so that the multilayer defect can be "inverted", or recovered from the top layer profile using a calibrated model.

  2. Material design of negative-tone polyphenol resist for EUV and EB lithography

    Science.gov (United States)

    Kojima, Kyoko; Mori, Shigeki; Shiono, Daiju; Hada, Hideo; Onodera, Junichi

    2007-03-01

    In order to enable design of a negative-tone polyphenol resist using polarity-change reaction, five resist compounds (3M6C-MBSA-BLs) with different number of functional group of γ-hydroxycarboxyl acid were prepared and evaluated by EB lithography. The resist using mono-protected compound (3M6C-MBSA-BL1a) showed 40-nm hp resolution at an improved dose of 52 μC/cm2 probably due to removal of a non-protected polyphenol while the sensitivity of the resist using a compound of protected ratio of 1.1 on average with distribution of different protected ratio was 72 μC/cm2. For evaluation of the di-protected compound based resist, a di-protected polyphenol was synthesized by a newly developed synthetic route of 3-steps reaction, which is well-suited for mass production. The resist using di-protected compound (3M6C-MBSA-BL2b) also showed 40-nm hp resolution at a dose of 40 μC/cm2, which was faster than that of mono-protected resist. Fundamental EUV lithographic evaluation of the resist using 3M6C-MBSA-BL2b by an EUV open frame exposure tool (EUVES-7000) gave its estimated optimum sensitivity of 7 mJ/cm2 and a proof of fine development behavior without any swelling.

  3. PERSISTENCE MAPPING USING EUV SOLAR IMAGER DATA

    Energy Technology Data Exchange (ETDEWEB)

    Thompson, B. J. [NASA Goddard Space Flight Center, Code 671, Greenbelt, MD 20771 (United States); Young, C. A., E-mail: barbara.j.thompson@nasa.gov [NASA Goddard Space Flight Center, Code 670, Greenbelt, MD 20771 (United States)

    2016-07-01

    We describe a simple image processing technique that is useful for the visualization and depiction of gradually evolving or intermittent structures in solar physics extreme-ultraviolet imagery. The technique is an application of image segmentation, which we call “Persistence Mapping,” to isolate extreme values in a data set, and is particularly useful for the problem of capturing phenomena that are evolving in both space and time. While integration or “time-lapse” imaging uses the full sample (of size N ), Persistence Mapping rejects ( N − 1)/ N of the data set and identifies the most relevant 1/ N values using the following rule: if a pixel reaches an extreme value, it retains that value until that value is exceeded. The simplest examples isolate minima and maxima, but any quantile or statistic can be used. This paper demonstrates how the technique has been used to extract the dynamics in long-term evolution of comet tails, erupting material, and EUV dimming regions.

  4. Measuring Modularity in Open Source Code Bases

    Directory of Open Access Journals (Sweden)

    Roberto Milev

    2009-03-01

    Full Text Available Modularity of an open source software code base has been associated with growth of the software development community, the incentives for voluntary code contribution, and a reduction in the number of users who take code without contributing back to the community. As a theoretical construct, modularity links OSS to other domains of research, including organization theory, the economics of industry structure, and new product development. However, measuring the modularity of an OSS design has proven difficult, especially for large and complex systems. In this article, we describe some preliminary results of recent research at Carleton University that examines the evolving modularity of large-scale software systems. We describe a measurement method and a new modularity metric for comparing code bases of different size, introduce an open source toolkit that implements this method and metric, and provide an analysis of the evolution of the Apache Tomcat application server as an illustrative example of the insights gained from this approach. Although these results are preliminary, they open the door to further cross-discipline research that quantitatively links the concerns of business managers, entrepreneurs, policy-makers, and open source software developers.

  5. Interferometry using undulator sources

    International Nuclear Information System (INIS)

    Beguiristain, R.; Goldberg, K.A.; Tejnil, E.; Bokor, J.; Medecki, H.; Attwood, D.T.; Jackson, K.

    1996-01-01

    Optical systems for extreme ultraviolet (EUV) lithography need to use optical components with subnanometer surface figure error tolerances to achieve diffraction-limited performance [M.D. Himel, in Soft X-Ray Projection Lithography, A.M. Hawryluk and R.H. Stulen, eds. (OSA, Washington, D.C., 1993), 18, 1089, and D. Attwood et al., Appl. Opt. 32, 7022 (1993)]. Also, multilayer-coated optics require at-wavelength wavefront measurement to characterize phase effects that cannot be measured by conventional optical interferometry. Furthermore, EUV optical systems will additionally require final testing and alignment at the operational wavelength for adjustment and reduction of the cumulative optical surface errors. Therefore, at-wavelength interferometric measurement of EUV optics will be the necessary metrology tool for the successful development of optics for EUV lithography. An EUV point diffraction interferometer (PDI) has been developed at the Center for X-Ray Optics (CXRO) and has been already in operation for a year [K. Goldberg et al., in Extreme Ultra Lithography, D.T. Attwood and F. Zernike, eds. (OSA, Washington, D.C., 1994), K. Goldberg et al., Proc. SPIE 2437, to be published, and K. Goldberg et al., J. Vac. Sci. Technol. B 13, 2923 (1995)] using an undulator radiation source and coherent optics beamline at the Advanced Light Source (ALS) at Lawrence Berkeley National Laboratory. An overview of the PDI interferometer and some EUV wavefront measurements obtained with this instrument will be presented. In addition, future developments planned for EUV interferometry at CXRO towards the measurement of actual EUV lithography optics will be shown. copyright 1996 American Institute of Physics

  6. EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

    Science.gov (United States)

    Attwood, David

    2004-12-01

    The International Technology Roadmap for Semiconductors (ITRS) [1] provides industry expectations for high volume computer chip fabrication a decade into the future. It provides expectations to anticipated performance and requisite specifications. While the roadmap provides a collective projection of what international industry expects to produce, it does not specify the technology that will be employed. Indeed, there are generally several competing technologies for each two or three year step forward—known as `nodes'. Recent successful technologies have been based on KrF (248 nm), and now ArF (193 nm) lasers, combined with ultraviolet transmissive refractive optics, in what are known as step and scan exposure tools. Less fortunate technologies in the recent past have included soft x-ray proximity printing and, it appears, 157 nm wavelength F2 lasers. In combination with higher numerical aperture liquid emersion optics, 193 nm is expected to be used for the manufacture of leading edge chip performance for the coming five years. Beyond that, starting in about 2009, the technology to be employed is less clear. The leading candidate for the 2009 node is extreme ultraviolet (EUV) lithography, however this requires that several remaining challenges, including sufficient EUV source power, be overcome in a timely manner. This technology is based on multilayer coated reflective optics [2] and an EUV emitting plasma. Following Moore's Law [3] it is expected, for example, that at the 2009 `32 nm node' (printable patterns of 32 nm half-pitch), isolated lines with 18 nm width will be formed in resist (using threshold effects), and that these will be further narrowed to 13 nm in transfer to metalized electronic gates. These narrow features are expected to provide computer chips of 19 GHz clock frequency, with of the order of 1.5 billion transistors per chip [1]. This issue of Journal of Physics D: Applied Physics contains a cluster of eight papers addressing the critical

  7. Ni-Al Alloys as Alternative EUV Mask Absorber

    Directory of Open Access Journals (Sweden)

    Vu Luong

    2018-03-01

    Full Text Available Extreme ultraviolet (EUV lithography is being industrialized as the next candidate printing technique for high-volume manufacturing of scaled down integrated circuits. At mask level, the combination of EUV light at oblique incidence, absorber thickness, and non-uniform mirror reflectance through incidence angle, creates photomask-induced imaging aberrations, known as mask 3D (M3D effects. A possible mitigation for the M3D effects in the EUV binary intensity mask (BIM, is to use mask absorber materials with high extinction coefficient κ and refractive coefficient n close to unity. We propose nickel aluminide alloys as a candidate BIM absorber material, and characterize them versus a set of specifications that a novel EUV mask absorber must meet. The nickel aluminide samples have reduced crystallinity as compared to metallic nickel, and form a passivating surface oxide layer in neutral solutions. Composition and density profile are investigated to estimate the optical constants, which are then validated with EUV reflectometry. An oxidation-induced Al L2 absorption edge shift is observed, which significantly impacts the value of n at 13.5 nm wavelength and moves it closer to unity. The measured optical constants are incorporated in an accurate mask model for rigorous simulations. The M3D imaging impact of the nickel aluminide alloy mask absorbers, which predict significant M3D reduction in comparison to reference absorber materials. In this paper, we present an extensive experimental methodology flow to evaluate candidate mask absorber materials.

  8. A two-step method for fast and reliable EUV mask metrology

    Science.gov (United States)

    Helfenstein, Patrick; Mochi, Iacopo; Rajendran, Rajeev; Yoshitake, Shusuke; Ekinci, Yasin

    2017-03-01

    One of the major obstacles towards the implementation of extreme ultraviolet lithography for upcoming technology nodes in semiconductor industry remains the realization of a fast and reliable detection methods patterned mask defects. We are developing a reflective EUV mask-scanning lensless imaging tool (RESCAN), installed at the Swiss Light Source synchrotron at the Paul Scherrer Institut. Our system is based on a two-step defect inspection method. In the first step, a low-resolution defect map is generated by die to die comparison of the diffraction patterns from areas with programmed defects, to those from areas that are known to be defect-free on our test sample. In a later stage, a die to database comparison will be implemented in which the measured diffraction patterns will be compared to those calculated directly from the mask layout. This Scattering Scanning Contrast Microscopy technique operates purely in the Fourier domain without the need to obtain the aerial image and, given a sufficient signal to noise ratio, defects are found in a fast and reliable way, albeit with a location accuracy limited by the spot size of the incident illumination. Having thus identified rough locations for the defects, a fine scan is carried out in the vicinity of these locations. Since our source delivers coherent illumination, we can use an iterative phase-retrieval method to reconstruct the aerial image of the scanned area with - in principle - diffraction-limited resolution without the need of an objective lens. Here, we will focus on the aerial image reconstruction technique and give a few examples to illustrate the capability of the method.

  9. X radiation sources based on accelerators

    International Nuclear Information System (INIS)

    Couprie, M.E.; Filhol, J.M.

    2008-01-01

    Light sources based on accelerators aim at producing very high brilliance coherent radiation, tunable from the infrared to X-ray range, with picosecond or femtosecond light pulses. The first synchrotron light sources were built around storage rings in which a large number of relativistic electrons produce 'synchrotron radiation' when their trajectory is subjected to a magnetic field, either in bending magnets or in specific insertion devices (undulators), made of an alternating series of magnets, allowing the number of curvatures to be increased and the radiation to be reinforced. These 'synchrotron radiation' storage rings are now used worldwide (there are more than thirty), and they simultaneously distribute their radiation to several tens of users around the storage ring. The most effective installations in term of brilliance are the so-called third generation synchrotron radiation light sources. The radiation produced presents pulse durations of the order of a few tens of ps, at a high rate (of the order of MHz); it is tunable over a large range, depending on the magnetic field and the electron beam energy and its polarisation is adjustable (in the V-UV-soft-X range). Generally, a very precise spectral selection is made by the users with a monochromator. The single pass linear accelerators can produce very short electron bunches (around 100 fs). The beam of very high electronic density is sent into successive undulator modules, reinforcing the radiation's longitudinal coherence, produced according to a Free Electron Laser (FEL) scheme by the interaction between the electron bunch and a light wave. The very high peak brilliance justifies their designation as fourth generation sources. The number of users is smaller because an electron pulse produces a radiation burst towards only one beamline. Energy Recovery Linacs (ERL) let the beam pass several times in the accelerator structures either to recover the energy or to accelerate the electrons during several turns

  10. Synchrotron based spallation neutron source concepts

    International Nuclear Information System (INIS)

    Cho, Y.

    1998-01-01

    During the past 20 years, rapid-cycling synchrotrons (RCS) have been used very productively to generate short-pulse thermal neutron beams for neutron scattering research by materials science communities in Japan (KENS), the UK (ISIS) and the US (IPNS). The most powerful source in existence, ISIS in the UK, delivers a 160-kW proton beam to a neutron-generating target. Several recently proposed facilities require proton beams in the MW range to produce intense short-pulse neutron beams. In some proposals, a linear accelerator provides the beam power and an accumulator ring compresses the pulse length to the required ∼ 1 micros. In others, RCS technology provides the bulk of the beam power and compresses the pulse length. Some synchrotron-based proposals achieve the desired beam power by combining two or more synchrotrons of the same energy, and others propose a combination of lower and higher energy synchrotrons. This paper presents the rationale for using RCS technology, and a discussion of the advantages and disadvantages of synchrotron-based spallation sources

  11. Design decisions from the history of the EUVE science payload

    Science.gov (United States)

    Marchant, W.

    1993-01-01

    Some of the design issues that arose during the development of the EUVE science payload and solutions to the problems involved are examined. In particular, attention is given to the use of parallel and serial busses, the selection of the the ROM approach for software storage and execution, implementation of memory error detection and correction, and the selection of command structures. The early design decisions paid off in the timely delivery of the scientific payload and in the successful completion of the survey phase of the EUVE science mission.

  12. Compact and Light-Weight Solar Spaceflight Instrument Designs Utilizing Newly Developed Miniature Free-Standing Zone Plates: EUV Radiometer and Limb-Scanning Monochromator

    Science.gov (United States)

    Seely, J. F.; McMullin, D. R.; Bremer, J.; Chang, C.; Sakdinawat, A.; Jones, A. R.; Vest, R.

    2014-12-01

    Two solar instrument designs are presented that utilize newly developed miniature free-standing zone plates having interconnected Au opaque bars and no support membrane resulting in excellent long-term stability in space. Both instruments are based on a zone plate having 4 mm outer diameter and 1 to 2 degree field of view. The zone plate collects EUV radiation and focuses a narrow bandpass through a pinhole aperture and onto a silicon photodiode detector. As a miniature radiometer, EUV irradiance is accurately determined from the zone plate efficiency and the photodiode responsivity that are calibrated at the NIST SURF synchrotron facility. The EUV radiometer is pointed to the Sun and measures the absolute solar EUV irradiance in high time cadence suitable for solar physics and space weather applications. As a limb-scanning instrument in low earth orbit, a miniature zone-plate monochromator measures the extinction of solar EUV radiation by scattering through the upper atmosphere which is a measure of the variability of the ionosphere. Both instruments are compact and light-weight and are attractive for CubeSats and other missions where resources are extremely limited.

  13. Heating mechanisms for intermittent loops in active region cores from AIA/SDO EUV observations

    Energy Technology Data Exchange (ETDEWEB)

    Cadavid, A. C.; Lawrence, J. K.; Christian, D. J. [Department of Physics and Astronomy, California State University Northridge, Northridge, CA 91330 (United States); Jess, D. B. [Astrophysics Research Centre, School of Mathematics and Physics, Queen' s University Belfast, Belfast BT7 1NN (United Kingdom); Nigro, G. [Universita della Calabria, Dipartimento di Fisica and Centro Nazionale Interuniversitario Struttura della Materia, Unita di Cosenza, I-87030 Arcavacata di Rende (Italy)

    2014-11-01

    We investigate intensity variations and energy deposition in five coronal loops in active region cores. These were selected for their strong variability in the AIA/SDO 94 Å intensity channel. We isolate the hot Fe XVIII and Fe XXI components of the 94 Å and 131 Å by modeling and subtracting the 'warm' contributions to the emission. HMI/SDO data allow us to focus on 'inter-moss' regions in the loops. The detailed evolution of the inter-moss intensity time series reveals loops that are impulsively heated in a mode compatible with a nanoflare storm, with a spike in the hot 131 Å signals leading and the other five EUV emission channels following in progressive cooling order. A sharp increase in electron temperature tends to follow closely after the hot 131 Å signal confirming the impulsive nature of the process. A cooler process of growing emission measure follows more slowly. The Fourier power spectra of the hot 131 Å signals, when averaged over the five loops, present three scaling regimes with break frequencies near 0.1 min{sup –1} and 0.7 min{sup –1}. The low frequency regime corresponds to 1/f noise; the intermediate indicates a persistent scaling process and the high frequencies show white noise. Very similar results are found for the energy dissipation in a 2D 'hybrid' shell model of loop magneto-turbulence, based on reduced magnetohydrodynamics, that is compatible with nanoflare statistics. We suggest that such turbulent dissipation is the energy source for our loops.

  14. Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

    Energy Technology Data Exchange (ETDEWEB)

    Sizyuk, V.; Hassanein, A.; Morozov, V.; Sizyuk, T.; Mathematics and Computer Science

    2007-01-16

    The HEIGHTS integrated model has been developed as an instrument for simulation and optimization of laser-produced plasma (LPP) sources relevant to extreme ultraviolet (EUV) lithography. The model combines three general parts: hydrodynamics, radiation transport, and heat conduction. The first part employs a total variation diminishing scheme in the Lax-Friedrich formulation (TVD-LF); the second part, a Monte Carlo model; and the third part, implicit schemes with sparse matrix technology. All model parts consider physical processes in three-dimensional geometry. The influence of a generated magnetic field on laser plasma behavior was estimated, and it was found that this effect could be neglected for laser intensities relevant to EUV (up to {approx}10{sup 12} W/cm{sup 2}). All applied schemes were tested on analytical problems separately. Benchmark modeling of the full EUV source problem with a planar tin target showed good correspondence with experimental and theoretical data. Preliminary results are presented for tin droplet- and planar-target LPP devices. The influence of three-dimensional effects on EUV properties of source is discussed.

  15. Negating HIO-induced metal and carbide EUV surface contamination

    NARCIS (Netherlands)

    Sturm, Jacobus Marinus; Gleeson, Michael; van de Kruijs, Robbert Wilhelmus Elisabeth; Lee, Christopher James; Kleyn, A.W.; Bijkerk, Frederik

    2011-01-01

    The next generation photolithography will use 13.5 nm Extreme Ultraviolet (EUV) light in order to reduce feature sizes in semiconductor manufactoring. Lens materials for this wavelength do not exist: image projection requires multilayer mirrors that act as an artificial Bragg crystal.

  16. The EUV Spectrum of Sunspot Plumes Observed by SUMER on ...

    Indian Academy of Sciences (India)

    tribpo

    Abstract. We present results from sunspot observations obtained by. SUMER on SOHO. In sunspot plumes the EUV spectrum differs from the quiet Sun; continua are observed with different slopes and intensities; emission lines from molecular hydrogen and many unidentified species indicate unique plasma conditions ...

  17. Formation dynamics of UV and EUV induced hydrogen plasma

    NARCIS (Netherlands)

    Dolgov, A.A.; Lee, Christopher James; Yakushev, O.; Lopaev, D.V.; Abrikosov, A.; Krivtsun, V.M.; Zotovich, A.; Bijkerk, F.

    2014-01-01

    The comparative study of the dynamics of ultraviolet (UV) and extreme ultraviolet (EUV) induced hydrogen plasma was performed. It was shown that for low H2 pressures and bias voltages, the dynamics of the two plasmas are significantly different. In the case of UV radiation, the plasma above the

  18. The EUVE Mission at UCB: Squeezing More From Less

    Science.gov (United States)

    Stroozas, B. A.; Cullison, J. L.; McDonald, K. E.; Nevitt, R.; Malina, R. F.

    2000-05-01

    With 8 years on orbit, and over three years in an outsourced mode at U.C. Berkeley (UCB), NASA's Extreme Ultraviolet Explorer (EUVE) continues to be a highly mature and productive scientific mission. The EUVE satellite is extremely stable and exhibits little degradation in its original scientific capabilities, and science data return continues to be at the >99% level. The Project's very small, dedicated, innovative, and relatively cheap ( \\$1 million/year) support team at UCB continues to validate the success of NASA's outsourcing "experiment" while providing a very high science-per-dollar return on NASA's investment with no significant additional risk to the flight systems. The EUVE mission still has much more to offer in terms of important and exciting scientific discoveries as well as mission operations innovations. To highlight this belief the EUVE team at UCB continues to find creative ways to do more with less -- to squeeze the maximum out of available funds -- in NASA's "cheaper, better, faster" environment. This paper provides an overview of the EUVE mission's past, current, and potential future efforts toward automating and integrating its multi-functional data processing systems in proposal management, observation planning, mission operations and engineering, and the processing, archival, and delivery of raw telemetry and science data products. The paper will also discuss the creative allocation of the Project's few remaining personnel resources who support both core mission functions and new innovations, while at the same time minimizing overall risk and stretching the available budget. This work is funded through NASA/UCB Cooperative Agreement NCC5-138.

  19. PROJECTION EFFECTS IN CORONAL DIMMINGS AND ASSOCIATED EUV WAVE EVENT

    Energy Technology Data Exchange (ETDEWEB)

    Dissauer, K.; Temmer, M.; Veronig, A. M.; Vanninathan, K. [IGAM/Institute of Physics, University of Graz, Universitätsplatz 5/II, A-8010 Graz (Austria); Magdalenić, J., E-mail: karin.dissauer@uni-graz.at [Solar-Terrestrial Center of Excellence-SIDC, Royal Observatory of Belgium, Av. Circulaire 3, B-1180 Brussels (Belgium)

    2016-10-20

    We investigate the high-speed ( v > 1000 km s{sup −1}) extreme-ultraviolet (EUV) wave associated with an X1.2 flare and coronal mass ejection (CME) from NOAA active region 11283 on 2011 September 6 (SOL2011-09-06T22:12). This EUV wave features peculiar on-disk signatures; in particular, we observe an intermittent “disappearance” of the front for 120 s in Solar Dynamics Observatory ( SDO )/AIA 171, 193, 211 Å data, whereas the 335 Å filter, sensitive to hotter plasmas ( T ∼ 2.5 MK), shows a continuous evolution of the wave front. The eruption was also accompanied by localized coronal dimming regions. We exploit the multi-point quadrature position of SDO and STEREO-A , to make a thorough analysis of the EUV wave evolution, with respect to its kinematics and amplitude evolution and reconstruct the SDO line-of-sight (LOS) direction of the identified coronal dimming regions in STEREO-A . We show that the observed intensities of the dimming regions in SDO /AIA depend on the structures that are lying along their LOS and are the combination of their individual intensities, e.g., the expanding CME body, the enhanced EUV wave, and the CME front. In this context, we conclude that the intermittent disappearance of the EUV wave in the AIA 171, 193, and 211 Å filters, which are channels sensitive to plasma with temperatures below ∼2 MK is also caused by such LOS integration effects. These observations clearly demonstrate that single-view image data provide us with limited insight to correctly interpret coronal features.

  20. EUV high resolution imager on-board solar orbiter: optical design and detector performances

    Science.gov (United States)

    Halain, J. P.; Mazzoli, A.; Rochus, P.; Renotte, E.; Stockman, Y.; Berghmans, D.; BenMoussa, A.; Auchère, F.

    2017-11-01

    The EUV high resolution imager (HRI) channel of the Extreme Ultraviolet Imager (EUI) on-board Solar Orbiter will observe the solar atmospheric layers at 17.4 nm wavelength with a 200 km resolution. The HRI channel is based on a compact two mirrors off-axis design. The spectral selection is obtained by a multilayer coating deposited on the mirrors and by redundant Aluminum filters rejecting the visible and infrared light. The detector is a 2k x 2k array back-thinned silicon CMOS-APS with 10 μm pixel pitch, sensitive in the EUV wavelength range. Due to the instrument compactness and the constraints on the optical design, the channel performance is very sensitive to the manufacturing, alignments and settling errors. A trade-off between two optical layouts was therefore performed to select the final optical design and to improve the mirror mounts. The effect of diffraction by the filter mesh support and by the mirror diffusion has been included in the overall error budget. Manufacturing of mirror and mounts has started and will result in thermo-mechanical validation on the EUI instrument structural and thermal model (STM). Because of the limited channel entrance aperture and consequently the low input flux, the channel performance also relies on the detector EUV sensitivity, readout noise and dynamic range. Based on the characterization of a CMOS-APS back-side detector prototype, showing promising results, the EUI detector has been specified and is under development. These detectors will undergo a qualification program before being tested and integrated on the EUI instrument.

  1. Photon acceleration-based radiation sources

    International Nuclear Information System (INIS)

    Hoffman, J. R.; Muggli, P.; Katsouleas, T.; Mori, W. B.; Joshi, C.

    1999-01-01

    The acceleration and deceleration of photons in a plasma provides the means for a series of new radiation sources. Previous work on a DC to AC Radiation Converter (DARC source) has shown variable acceleration of photons having zero frequency (i.e., an electrostatic field) to between 6 and 100 GHz (1-3). These sources all had poor guiding characteristics resulting in poor power coupling from the source to the load. Continuing research has identified a novel way to integrate the DARC source into a waveguide. The so called ''pin structure'' uses stainless steel pins inserted through the narrow side of an X band waveguide to form the electrostatic field pattern (k≠0, ω=0). The pins are spaced such that the absorption band resulting from this additional periodic structure is outside of the X band range (8-12 GHz), in which the normal waveguide characteristics are left unchanged. The power of this X band source is predicted theoretically to scale quadratically with the pin bias voltage as -800 W/(kV) 2 and have a pulse width of -1 ns. Cold tests and experimental results are presented. Applications for a high power, short pulse radiation source extends to the areas of landmine detection, improved radar resolution, and experimental investigations of molecular systems

  2. A problem to be solved for tungsten diagnostics through EUV spectroscopy in fusion devices

    International Nuclear Information System (INIS)

    Morita, S.; Murakami, I.; Sakaue, H.A.; Dong, C.F.; Goto, M.; Kato, D.; Oishi, T.; Huang, X.L.; Wang, E.H.

    2013-01-01

    Tungsten spectra have been observed from Large Helical Device (LHD) in extreme ultraviolet (EUV) wavelength ranges of 10-650Å. When the electron temperature is less than 2keV, the EUV spectra from plasma core are dominated by unresolved transition array (UTA) composing of a lot of spectral lines, e.g., 6g-4f, 5g-4f, 5f-4d and 5p-4d transitions for W"+"2"4"-"+"3"3 in 15-35Å. In order to understand the UTA spectrum, the EUV spectra measured from LHD plasmas are compared to those measured from Compact electron Beam Ion Trap (CoBIT), in which the electron beam is operated with monoenergetic energy of E_e ≤ 2keV. The tungsten spectra from LHD are well analyzed based on the knowledge from CoBIT tungsten spectra. The collisional-radiative (C-R) model has been developed to explain the UTA spectra from LHD in details. Radial profiles of EUV spectra from highly ionized tungsten ions have been measured and analyzed by impurity transport simulation code with ADPAK atomic database to examine the ionization balance determined by ionization and recombination rate coefficients. If the electron temperature is higher than 2keV, Zn-like WXLV (W"4"4"+) and Cu-like WXLVI (W"4"5"+) spectra can be observed in LHD. Such ions of W"4"4"+ and W"4"5"+ can exhibit much simpler atomic configuration compared to other ionization stages of tungsten. Quantitative analysis of the tungsten density is attempted for the first time on the radial profile of Zn-like WXLV (W"4"4"+) 4p-4s transition measured at 60.9Å, based on the emission rate coefficient calculated with HULLAC code. As a result, a total tungsten ion density of 3.5x10"1"0 cm"-"3 at the plasma center of LHD is reasonably obtained. Finally, the present problem for tungsten diagnostics in fusion plasmas is summarized. (author)

  3. Neutron Sources for Standard-Based Testing

    Energy Technology Data Exchange (ETDEWEB)

    Radev, Radoslav [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States); McLean, Thomas [Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

    2014-11-10

    The DHS TC Standards and the consensus ANSI Standards use 252Cf as the neutron source for performance testing because its energy spectrum is similar to the 235U and 239Pu fission sources used in nuclear weapons. An emission rate of 20,000 ± 20% neutrons per second is used for testing of the radiological requirements both in the ANSI standards and the TCS. Determination of the accurate neutron emission rate of the test source is important for maintaining consistency and agreement between testing results obtained at different testing facilities. Several characteristics in the manufacture and the decay of the source need to be understood and accounted for in order to make an accurate measurement of the performance of the neutron detection instrument. Additionally, neutron response characteristics of the particular instrument need to be known and taken into account as well as neutron scattering in the testing environment.

  4. Mask characterization for CDU budget breakdown in advanced EUV lithography

    Science.gov (United States)

    Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

    2012-11-01

    As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget

  5. EUV-driven ionospheres and electron transport on extrasolar giant planets orbiting active stars

    Science.gov (United States)

    Chadney, J. M.; Galand, M.; Koskinen, T. T.; Miller, S.; Sanz-Forcada, J.; Unruh, Y. C.; Yelle, R. V.

    2016-03-01

    The composition and structure of the upper atmospheres of extrasolar giant planets (EGPs) are affected by the high-energy spectrum of their host stars from soft X-rays to the extreme ultraviolet (EUV). This emission depends on the activity level of the star, which is primarily determined by its age. In this study, we focus upon EGPs orbiting K- and M-dwarf stars of different ages - ɛ Eridani, AD Leonis, AU Microscopii - and the Sun. X-ray and EUV (XUV) spectra for these stars are constructed using a coronal model. These spectra are used to drive both a thermospheric model and an ionospheric model, providing densities of neutral and ion species. Ionisation - as a result of stellar radiation deposition - is included through photo-ionisation and electron-impact processes. The former is calculated by solving the Lambert-Beer law, while the latter is calculated from a supra-thermal electron transport model. We find that EGP ionospheres at all orbital distances considered (0.1-1 AU) and around all stars selected are dominated by the long-lived H+ ion. In addition, planets with upper atmospheres where H2 is not substantially dissociated (at large orbital distances) have a layer in which H3+ is the major ion at the base of the ionosphere. For fast-rotating planets, densities of short-lived H3+ undergo significant diurnal variations, with the maximum value being driven by the stellar X-ray flux. In contrast, densities of longer-lived H+ show very little day/night variability and the magnitude is driven by the level of stellar EUV flux. The H3+ peak in EGPs with upper atmospheres where H2 is dissociated (orbiting close to their star) under strong stellar illumination is pushed to altitudes below the homopause, where this ion is likely to be destroyed through reactions with heavy species (e.g. hydrocarbons, water). The inclusion of secondary ionisation processes produces significantly enhanced ion and electron densities at altitudes below the main EUV ionisation peak, as

  6. Exploring EUV Spicules Using 304 Ang He II Data from SDO/AIA

    Science.gov (United States)

    Snyder, Ian; Sterling, Alphonse C.; Falconer, David A.; Moore, Ronald L.

    2015-01-01

    We present results from a statistical study of He II 304 Angstrom EUV spicules and macrospicules at the limb of the Sun. We use high-cadence (12 sec) and high-resolution (0.6 arcsec pixels) resolution data from the Atmospheric Imaging Array (AIA) instrument on the Solar Dynamic Observatory (SDO). All of the observed events occurred in quiet or coronal hole regions near the solar pole. Spicules and macrospicules are typically transient jet-like chromospheric-material features, the macrospicules are wider and have taller maximum heights than the spicules. We looked for characteristics of the populations of these two phenomena that might indicate whether they have the same or different initiation mechanisms. We examined the maximum heights, time-averaged rise velocities, and lifetimes of about two dozen EUV spicules and about five EUV macrospicules. For spicules, these quantities are, respectively, approx. 5-30 km, 5-50 km/s, and a few 100- approx. 1000 sec. Macrospicules were approx. 60,000 km, 55 km/s, and had lifetimes of approx. 1800 sec. Therefore the macrospicules were taller and longer-lived than the spicules, and had velocities comparable to that of the fastest spicules. The rise profiles of both the spicules and the macrospicules matched well a second-order ("parabolic'') trajectory, although the acceleration was generally weaker than that of solar gravity in the profiles fitted to the trajectories. The Macrospicules also had obvious brightenings at their bases at their birth, while such brightenings were not apparent for most of the spicules. Most of the spicules and several of the macrospicules remained visible during their decent back to the solar surface, although a small percentage of the spicules faded out before their fall was completed. Are findings are suggestive of the two phenomena possibly having different initiation mechanisms, but this is not yet conclusive. Qualitatively the EUV 304 Angstrom spicules match well the properties quoted for "Type I

  7. A Web Based Puzzle for Energy Sources

    Science.gov (United States)

    Secken, Nilgun

    2006-01-01

    At present many countries in the world consume too much fossil fuels such as petroleum, natural gas and coal to meet their energy needs. These fossil fuels are not renewable; their sources are limited and reducing gradually. More importantly they have been becoming more expensive day by day and their damage to the environment has been increasing.…

  8. Optical, UV, and EUV Oscillations of SS Cygni in Outburst

    Science.gov (United States)

    Mauche, Christopher W.

    2004-07-01

    I provide a review of observations in the optical, UV (HST), and EUV (EUVE and Chandra LETG) of the rapid periodic oscillations of nonmagnetic, disk-accreting, high mass-accretion rate cataclysmic variables (CVs), with particular emphasis on the dwarf nova SS Cyg in outburst. In addition, I drawn attention to a correlation, valid over nearly six orders of magnitude in frequency, between the frequencies of the quasi-periodic oscillations (QPOs) of white dwarf, neutron star, and black hole binaries. This correlation identifies the high frequency quasi-coherent oscillations (so-called ``dwarf nova oscillations'') of CVs with the kilohertz QPOs of low mass X-ray binaries (LMXBs), and the low frequency and low coherence QPOs of CVs with the horizontal branch oscillations (or the broad noise component identified as such) of LMXBs. Assuming that the same mechanisms produce the QPOs of white dwarf, neutron star, and black hole binaries, this correlation has important implications for QPO models.

  9. EUV lithographic radiation grafting of thermo-responsive hydrogel nanostructures

    International Nuclear Information System (INIS)

    Farquet, Patrick; Padeste, Celestino; Solak, Harun H.; Guersel, Selmiye Alkan; Scherer, Guenther G.; Wokaun, Alexander

    2007-01-01

    Nanostructures of the thermoresponsive poly(N-isopropyl acrylamide) (PNIPAAm) and of PNIPAAm-block-poly(acrylic acid) copolymers were produced on poly(tetrafluoroethylene-co-ethyelene) (ETFE) films using extreme ultraviolet (EUV) lithographic exposure with subsequent graft-polymerization. The phase transition of PNIPAAm nanostructures at the low critical solution temperature (LCST) at 32 deg. C was imaged by atomic force microscopy (AFM) phase contrast measurements in pure water. Results show a higher phase contrast for samples measured below the LCST temperature than for samples above the LCST, proving that the soft PNIPAAm hydrogel transforms into a much more compact conformation above the LCST. EUV lithographic exposures were combined with the reversible addition-fragment chain transfer (RAFT)-mediated polymerization using cyanoisopropyl dithiobenzoate (CPDB) as chain transfer agent to synthesize PNIPAAm block-copolymer nanostructures

  10. The Diagnostics of the kappa-Distributions from EUV Spectra

    Czech Academy of Sciences Publication Activity Database

    Dzifčáková, Elena; Kulinová, Alena

    2010-01-01

    Roč. 263, 1-2 (2010), s. 25-41 ISSN 0038-0938 R&D Projects: GA ČR GA205/09/1705 Grant - others:VEGA(SK) 1/0069/08 Institutional research plan: CEZ:AV0Z10030501 Keywords : EUV spectra * non- thermal distributions * plasma diagnostics Subject RIV: BN - Astronomy, Celestial Mechanics, Astrophysics Impact factor: 3.386, year: 2010

  11. Inner shell transitions of BrI in the EUV

    Energy Technology Data Exchange (ETDEWEB)

    Mazzoni, M [Florence Univ. (Italy). Ist. di Astronomia; Pettini, M [Osservatorio Astrofisico di Arcetri, Florence (Italy)

    1981-10-12

    The EUV line spectrum originating from transitions of the inner 3d shell of neutral atomic bromine has been observed in absorption. Fano parameters have been derived for the three autoionized resonances nd/sup 10/(n + 1)s/sup 2/(n + 1)p/sup 5/ /sup 2/P-nd/sup 9/(n + 1)s/sup 2/(n + 1)p/sup 62/D observed in both bromine (n = 3) and iodine (n = 4) spectra.

  12. ERP correlates of source memory: unitized source information increases familiarity-based retrieval.

    Science.gov (United States)

    Diana, Rachel A; Van den Boom, Wijnand; Yonelinas, Andrew P; Ranganath, Charan

    2011-01-07

    Source memory tests typically require subjects to make decisions about the context in which an item was encoded and are thought to depend on recollection of details from the study episode. Although it is generally believed that familiarity does not contribute to source memory, recent behavioral studies have suggested that familiarity may also support source recognition when item and source information are integrated, or "unitized," during study (Diana, Yonelinas, and Ranganath, 2008). However, an alternative explanation of these behavioral findings is that unitization affects the manner in which recollection contributes to performance, rather than increasing familiarity-based source memory. To discriminate between these possibilities, we conducted an event-related potential (ERP) study testing the hypothesis that unitization increases the contribution of familiarity to source recognition. Participants studied associations between words and background colors using tasks that either encouraged or discouraged unitization. ERPs were recorded during a source memory test for background color. The results revealed two distinct neural correlates of source recognition: a frontally distributed positivity that was associated with familiarity-based source memory in the high-unitization condition only and a parietally distributed positivity that was associated with recollection-based source memory in both the high- and low-unitization conditions. The ERP and behavioral findings provide converging evidence for the idea that familiarity can contribute to source recognition, particularly when source information is encoded as an item detail. Copyright © 2010 Elsevier B.V. All rights reserved.

  13. The first detection of ionized helium in the local ISM - EUVE and IUE spectroscopy of the hot DA white dwarf GD 246

    Science.gov (United States)

    Vennes, Stephane; Dupuis, Jean; Rumph, Todd; Drake, Jeremy; Bowyer, Stuart; Chayer, Pierre; Fontaine, Gilles

    1993-01-01

    We report observations of the extreme ultraviolet spectrum of the hot degenerate star GD 246 obtained with the EUVE. Our initial attempt at modeling the photospheric emission from the white dwarf reveals a relatively uncontaminated pure H spectrum in the range above 200 A, allowing a study of interstellar continuum absorption features in the line of sight of GD 246. Modeling of the He I autoionization transition discussed by Rumph et al. (1993), and the EUV continuum using the white dwarf as a source of background radiation provides measurements of both neutral and, for the first time, singly ionized He column densities in the local ISM (LISM). We estimate the He ionization fraction He II/(He I + He II) at roughly 25 percent with a total He column of 1.40-1.65 x 10 exp 18/sq cm. We have measured and compared H I column densities from the saturated Ly-alpha ISM absorption in IUE high-dispersion spectroscopy and from EUV continuum absorption: the two measurements are in good agreement with a total H column of 1.2-1.6 x 10 exp 19/sq cm. We discuss some implications for the nature of the LISM, particularly in the context of current models of the EUV radiation field.

  14. Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

    International Nuclear Information System (INIS)

    Chen, Huadong; Zhang, Jun; Ma, Suli; Yan, Xiaoli; Xue, Jianchao

    2017-01-01

    We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19–20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearby coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ∼280 km s −1 . During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ∼8 G.

  15. Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

    Science.gov (United States)

    Chen, Huadong; Zhang, Jun; Ma, Suli; Yan, Xiaoli; Xue, Jianchao

    2017-05-01

    We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19-20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearby coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ˜280 km s-1. During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ˜8 G.

  16. Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Huadong; Zhang, Jun; Ma, Suli [Key Laboratory of Solar Activity, National Astronomical Observatories, Chinese Academy of Sciences, Beijing 100012 (China); Yan, Xiaoli [Yunnan Observatories, Chinese Academy of Sciences, Kunming 650011 (China); Xue, Jianchao, E-mail: hdchen@nao.cas.cn, E-mail: zjun@nao.cas.cn [Key Laboratory for Dark Matter and Space Science, Purple Mountain Observatory, Chinese Academy of Sciences, Nanjing 210008 (China)

    2017-05-20

    We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19–20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearby coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ∼280 km s{sup −1}. During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ∼8 G.

  17. High-Resolution EUV Spectroscopy of White Dwarfs

    Science.gov (United States)

    Kowalski, Michael P.; Wood, K. S.; Barstow, M. A.

    2014-01-01

    We compare results of high-resolution EUV spectroscopic measurements of the isolated white dwarf G191-B2B and the binary system Feige 24 obtained with the J-PEX (Joint Plasmadynamic Experiment), which was sponsored jointly by the U.S. Naval Research Laboratory and NASA. J-PEX delivers the world's highest resolution in EUV and does so at high effective area (e.g., more effective area in a sounding rocket than is available with Chandra at adjacent energies, but in a waveband Chandra cannot reach). The capability J-PEX represents is applicable to the astrophysics of hot plasmas in stellar coronae, white dwarfs and the ISM. G191-B2B and Feige 24 are quite distinct hot white dwarf systems having in common that they are bright in the portion of the EUV where He emission features and edges occur, hence they can be exploited to probe both the stellar atmosphere and the ISM, separating those components by model-fitting that sums over all relevant (He) spectral features in the band. There is evidence from these fits that atmospheric He is being detected but the result is more conservatively cast as a pair of upper limits. We discuss how longer duration satellite observations with the same instrumentation could increase exposure to detect atmospheric He in these and other nearby hot white dwarfs.

  18. The ENSDF based radionuclide source for MCNP

    International Nuclear Information System (INIS)

    Berlizov, A.N.; Tryshyn, V.V.

    2003-01-01

    A utility for generating source code of the Source subroutine of MCNP (a general Monte Carlo NxParticle transport code) on the basis of ENSDF (Evaluated Nuclear Structure Data File) is described. The generated code performs statistical simulation of processes, accompanying radioactive decay of a chosen radionuclide through a specified decay branch, providing characteristics of emitted correlated particles on its output. At modeling the following processes are taken into account: emission of continuum energy electrons at beta - -decay to different exited levels of a daughter nucleus; annihilation photon emission accompanying beta + -decay; gamma-ray emission; emission of discrete energy electrons resulted from internal conversion process on atomic K- and L I,II,III -shells; K and LX-ray emission at single and double fluorescence, accompanying electron capture and internal conversion processes. Number of emitted particles, their types, energies and emission times are sampled according to characteristics of a decay scheme of a particular radionuclide as well as characteristics of atomic shells of mother and daughter nuclei. Angular correlations, calculated for a particular combination of nuclear level spins, mixing ratios and gamma-ray multipolarities, are taken into account at sampling of directional cosines of emitted gamma-rays. The paper contains examples of spectrometry system response simulation at measurements with real radionuclide sources. (authors)

  19. Micro- and Nanoprocessing of Polymers Using a Laser Plasma Extreme Ultraviolet Source

    International Nuclear Information System (INIS)

    Bartnik, A.; Fiedorowicz, H.; Jarocki, R.; Kostecki, J.; Rakowski, R.; Szczurek, A.; Szczurek, M.

    2010-01-01

    Laser plasma with temperature of the order of tens eV can be an efficient source of extreme ultraviolet (EUV). The radiation can be focused using different kind of optics, giving sufficient fluence for some applications. In this work we present results of investigations concerning applications of a laser plasma EUV source based on a double stream gas puff target. The source was equipped with two different grazing incidence collectors. One of them was a multifoil collector, the second one was an axisymmetrical ellipsoidal collector. The multifoil mirror was used mainly in experiments concerning micromachining of organic polymers by direct photo-etching. The experiments were performed for different polymers that were irradiated through a fine metal grid as a contact mask. The smallest element of a pattern structure obtained in this way was 5 μm, while the structure height was 50 μm giving an aspect ratio about 10. The laser-plasma EUV source equipped with the axisymmetrical ellipsoidal collector was used for surface modification of organic polymers and inorganic solids. The surface morphology after irradiation was investigated. Different forms of micro- and nanostructures were obtained depending on material and irradiation conditions. (author)

  20. Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study

    Science.gov (United States)

    Wang, Yow-Gwo; Neureuther, Andrew; Naulleau, Patrick

    2016-03-01

    In this paper, we discuss the impact of optimized pupil engineering and photon noise on native defect sensitivity in EUV actinic blank inspection. Native defects include phase-dominated defects, absorber defects, and defects with a combination of phase and absorption behavior. First, we extend the idea of the Zernike phase contrast (ZPC) method and study the impact of optimum phase shift in the pupil plane on native defect sensitivity, showing a 23% signal-to-noise ratio (SNR) enhancement compare to bright field (BF) for a phase defect with 20% absorption. We also describe the possibility to increase target defect SNR on target defect sizes at the price of losing the sensitivity on smaller (non-critical) defects. Moreover, we show the advantage of the optimized phase contrast (OZPC) method over BF EUV actinic blank inspection. A single focus scan from OZPC has better inspection efficiency over BF. Second, we make a detailed comparison between the phase contrast with apodization (AZPC) method and dark field (DF) method based on defect sensitivity in the presence of both photon shot noise and camera noise. Performance is compared for a variety of photon levels, mask roughness conditions, and combinations of defect phase and absorption.

  1. Optimizing ring-based CSR sources

    International Nuclear Information System (INIS)

    Byrd, J.M.; De Santis, S.; Hao, Z.; Martin, M.C.; Munson, D.V.; Li, D.; Nishimura, H.; Robin, D.S.; Sannibale, F.; Schlueter, R.D.; Schoenlein, R.; Jung, J.Y.; Venturini, M.; Wan, W.; Zholents, A.A.; Zolotorev, M.

    2004-01-01

    Coherent synchrotron radiation (CSR) is a fascinating phenomenon recently observed in electron storage rings and shows tremendous promise as a high power source of radiation at terahertz frequencies. However, because of the properties of the radiation and the electron beams needed to produce it, there are a number of interesting features of the storage ring that can be optimized for CSR. Furthermore, CSR has been observed in three distinct forms: as steady pulses from short bunches, bursts from growth of spontaneous modulations in high current bunches, and from micro modulations imposed on a bunch from laser slicing. These processes have their relative merits as sources and can be improved via the ring design. The terahertz (THz) and sub-THz region of the electromagnetic spectrum lies between the infrared and the microwave . This boundary region is beyond the normal reach of optical and electronic measurement techniques and sources associated with these better-known neighbors. Recent research has demonstrated a relatively high power source of THz radiation from electron storage rings: coherent synchrotron radiation (CSR). Besides offering high power, CSR enables broadband optical techniques to be extended to nearly the microwave region, and has inherently sub-picosecond pulses. As a result, new opportunities for scientific research and applications are enabled across a diverse array of disciplines: condensed matter physics, medicine, manufacturing, and space and defense industries. CSR will have a strong impact on THz imaging, spectroscopy, femtosecond dynamics, and driving novel non-linear processes. CSR is emitted by bunches of accelerated charged particles when the bunch length is shorter than the wavelength being emitted. When this criterion is met, all the particles emit in phase, and a single-cycle electromagnetic pulse results with an intensity proportional to the square of the number of particles in the bunch. It is this quadratic dependence that can

  2. sources

    Directory of Open Access Journals (Sweden)

    Shu-Yin Chiang

    2002-01-01

    Full Text Available In this paper, we study the simplified models of the ATM (Asynchronous Transfer Mode multiplexer network with Bernoulli random traffic sources. Based on the model, the performance measures are analyzed by the different output service schemes.

  3. kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation

    Czech Academy of Sciences Publication Activity Database

    Endo, Akira; Smrž, Martin; Mužík, Jiří; Novák, Ondřej; Chyla, Michal; Mocek, Tomáš

    2017-01-01

    Roč. 16, č. 4 (2017), s. 1-6, č. článku 041011. ISSN 1932-5150 R&D Projects: GA MŠk LO1602; GA ČR GA16-12960S; GA MŠk LM2015086 EU Projects: European Commission(XE) 739573 - HiLASE CoE Grant - others:OP VVV - HiLASE-CoE(XE) CZ.02.1.01/0.0/0.0/15_006/0000674 Institutional support: RVO:68378271 Keywords : EUV source * laser produced plasma * FEL * prepulse * thin-disc laser Subject RIV: BH - Optics, Masers, Laser s OBOR OECD: Optics (including laser optics and quantum optics) Impact factor: 1.350, year: 2016

  4. Gasentladungsquelle, insbesondere fuer EUV-Strahlung

    OpenAIRE

    Neff, W.; Pruemmer, R.

    2006-01-01

    WO 2006123270 A2 UPAB: 20070123 NOVELTY - The source has two electrodes (1) with an approximately circular periphery rotatably mounted for rotation in a vacuum chamber. The electrodes are respectively connected to reservoirs (4) for a liquid via a connecting unit, where the connecting unit is designed in such a way that a gap tapers in a rotation direction of the electrodes. The reservoirs are positioned relatively freely so that the reservoirs no longer impair downward radiation emission. US...

  5. Compact laser-diode-based femtosecond sources

    International Nuclear Information System (INIS)

    Brown, C T A; Cataluna, M A; Lagatsky, A A; Rafailov, E U; Agate, M B; Leburn, C G; Sibbett, W

    2004-01-01

    This paper describes the development of compact femtosecond laser systems that are capable of being directly pumped by laser diodes or are based directly on laser diodes. The paper demonstrates the latest results in a highly efficient vibronic based gain medium and a diode-pumped Yb:KYW laser is reported that has a wall plug efficiency >14%. A Cr 4+ :YAG oscillator is described that generates transform-limited pulses of 81 fs duration at a pulse repetition frequency of >4 GHz. The development of Cr 3+ :LiSAF lasers that can be operated using power supplies based on batteries is briefly discussed. We also present a summary of work being carried out on the generation of fs-pulses from laser diodes and discuss the important issues in this area. Finally, we outline results obtained on the generation of pulses as short as 550 fs directly from a two-section quantum dot laser without any external pulse compression

  6. Use of accelerator based neutron sources

    International Nuclear Information System (INIS)

    2000-05-01

    With the objective of discussing new requirements related to the use of accelerator based neutron generators an Advisory Group meeting was held in October 1998 in Vienna. This meeting was devoted to the specific field of the utilization of accelerator based neutron generators. This TECDOC reports on the technical discussions and presentations that took place at this meeting and reflects the current status of neutron generators. The 14 MeV neutron generators manufactured originally for neutron activation analysis are utilised also for nuclear structure and reaction studies, nuclear data acquisition, radiation effects and damage studies, fusion related studies, neutron radiography

  7. Hiding the Source Based on Limited Flooding for Sensor Networks.

    Science.gov (United States)

    Chen, Juan; Lin, Zhengkui; Hu, Ying; Wang, Bailing

    2015-11-17

    Wireless sensor networks are widely used to monitor valuable objects such as rare animals or armies. Once an object is detected, the source, i.e., the sensor nearest to the object, generates and periodically sends a packet about the object to the base station. Since attackers can capture the object by localizing the source, many protocols have been proposed to protect source location. Instead of transmitting the packet to the base station directly, typical source location protection protocols first transmit packets randomly for a few hops to a phantom location, and then forward the packets to the base station. The problem with these protocols is that the generated phantom locations are usually not only near the true source but also close to each other. As a result, attackers can easily trace a route back to the source from the phantom locations. To address the above problem, we propose a new protocol for source location protection based on limited flooding, named SLP. Compared with existing protocols, SLP can generate phantom locations that are not only far away from the source, but also widely distributed. It improves source location security significantly with low communication cost. We further propose a protocol, namely SLP-E, to protect source location against more powerful attackers with wider fields of vision. The performance of our SLP and SLP-E are validated by both theoretical analysis and simulation results.

  8. Hiding the Source Based on Limited Flooding for Sensor Networks

    Directory of Open Access Journals (Sweden)

    Juan Chen

    2015-11-01

    Full Text Available Wireless sensor networks are widely used to monitor valuable objects such as rare animals or armies. Once an object is detected, the source, i.e., the sensor nearest to the object, generates and periodically sends a packet about the object to the base station. Since attackers can capture the object by localizing the source, many protocols have been proposed to protect source location. Instead of transmitting the packet to the base station directly, typical source location protection protocols first transmit packets randomly for a few hops to a phantom location, and then forward the packets to the base station. The problem with these protocols is that the generated phantom locations are usually not only near the true source but also close to each other. As a result, attackers can easily trace a route back to the source from the phantom locations. To address the above problem, we propose a new protocol for source location protection based on limited flooding, named SLP. Compared with existing protocols, SLP can generate phantom locations that are not only far away from the source, but also widely distributed. It improves source location security significantly with low communication cost. We further propose a protocol, namely SLP-E, to protect source location against more powerful attackers with wider fields of vision. The performance of our SLP and SLP-E are validated by both theoretical analysis and simulation results.

  9. Equivalent charge source model based iterative maximum neighbor weight for sparse EEG source localization.

    Science.gov (United States)

    Xu, Peng; Tian, Yin; Lei, Xu; Hu, Xiao; Yao, Dezhong

    2008-12-01

    How to localize the neural electric activities within brain effectively and precisely from the scalp electroencephalogram (EEG) recordings is a critical issue for current study in clinical neurology and cognitive neuroscience. In this paper, based on the charge source model and the iterative re-weighted strategy, proposed is a new maximum neighbor weight based iterative sparse source imaging method, termed as CMOSS (Charge source model based Maximum neighbOr weight Sparse Solution). Different from the weight used in focal underdetermined system solver (FOCUSS) where the weight for each point in the discrete solution space is independently updated in iterations, the new designed weight for each point in each iteration is determined by the source solution of the last iteration at both the point and its neighbors. Using such a new weight, the next iteration may have a bigger chance to rectify the local source location bias existed in the previous iteration solution. The simulation studies with comparison to FOCUSS and LORETA for various source configurations were conducted on a realistic 3-shell head model, and the results confirmed the validation of CMOSS for sparse EEG source localization. Finally, CMOSS was applied to localize sources elicited in a visual stimuli experiment, and the result was consistent with those source areas involved in visual processing reported in previous studies.

  10. Estimation and control of large-scale systems with an application to adaptive optics for EUV lithography

    NARCIS (Netherlands)

    Haber, A.

    2014-01-01

    Extreme UltraViolet (EUV) lithography is a new technology for production of integrated circuits. In EUV lithographic machines, optical elements are heated by absorption of exposure energy. Heating induces thermoelastic deformations of optical elements and consequently, it creates wavefront

  11. Electron Source based on Superconducting RF

    Science.gov (United States)

    Xin, Tianmu

    High-bunch-charge photoemission electron-sources operating in a Continuous Wave (CW) mode can provide high peak current as well as the high average current which are required for many advanced applications of accelerators facilities, for example, electron coolers for hadron beams, electron-ion colliders, and Free-Electron Lasers (FELs). Superconducting Radio Frequency (SRF) has many advantages over other electron-injector technologies, especially when it is working in CW mode as it offers higher repetition rate. An 112 MHz SRF electron photo-injector (gun) was developed at Brookhaven National Laboratory (BNL) to produce high-brightness and high-bunch-charge bunches for electron cooling experiments. The gun utilizes a Quarter-Wave Resonator (QWR) geometry for a compact structure and improved electron beam dynamics. The detailed RF design of the cavity, fundamental coupler and cathode stalk are presented in this work. A GPU accelerated code was written to improve the speed of simulation of multipacting, an important hurdle the SRF structure has to overcome in various locations. The injector utilizes high Quantum Efficiency (QE) multi-alkali photocathodes (K2CsSb) for generating electrons. The cathode fabrication system and procedure are also included in the thesis. Beam dynamic simulation of the injector was done with the code ASTRA. To find the optimized parameters of the cavities and beam optics, the author wrote a genetic algorithm Python script to search for the best solution in this high-dimensional parameter space. The gun was successfully commissioned and produced world record bunch charge and average current in an SRF photo-injector.

  12. Smart material-based radiation sources

    Science.gov (United States)

    Kovaleski, Scott

    2014-10-01

    From sensors to power harvesters, the unique properties of smart materials have been exploited in numerous ways to enable new applications and reduce the size of many useful devices. Smart materials are defined as materials whose properties can be changed in a controlled and often reversible fashion by use of external stimuli, such as electric and magnetic fields, temperature, or humidity. Smart materials have been used to make acceleration sensors that are ubiquitous in mobile phones, to make highly accurate frequency standards, to make unprecedentedly small actuators and motors, to seal and reduce friction of rotating shafts, and to generate power by conversion of either kinetic or thermal energy to electrical energy. The number of useful devices enabled by smart materials is large and continues to grow. Smart materials can also be used to generate plasmas and accelerate particles at small scales. The materials discussed in this talk are from non-centrosymmetric crystalline classes including piezoelectric, pyroelectric, and ferroelectric materials, which produce large electric fields in response to external stimuli such as applied electric fields or thermal energy. First, the use of ferroelectric, pyroelectric and piezoelectric materials for plasma generation and particle acceleration will be reviewed. The talk will then focus on the use of piezoelectric materials at the University of Missouri to construct plasma sources and electrostatic accelerators for applications including space propulsion, x-ray imaging, and neutron production. The basic concepts of piezoelectric transformers, which are analogous to conventional magnetic transformers, will be discussed, along with results from experiments over the last decade to produce micro-thrusters for space propulsion and particle accelerators for x-ray and neutron production. Support from ONR, AFOSR, and LANL.

  13. Sourcing Team Behavior in Project-Based MNE's

    DEFF Research Database (Denmark)

    Hansen, Anders Peder Lysholm

    2014-01-01

    across the three cases was characterized by conflict between departments represented in the category teams. This resulted in unfortunate sourcing team behaviour and unaligned performance management, which in turn had a number of adverse effects. Further research on how to create a holistic and balanced......This paper presents and discusses a multiple case study of three cross-functional category teams responsible for sourcing critical components within multi-national, project-based enterprises. The study focused on behaviour and management of the sourcing teams and found that the sourcing process...... team perspective in the sourcing teams is suggested....

  14. Photoionization of atoms and molecules by intense EUV-FEL pulses and FEL seeded by high-order harmonic of ultrashort laser pulses

    International Nuclear Information System (INIS)

    Iwasaki, Atsushi; Owada, Shigeki; Yamanouchi, Kaoru; Sato, Takahiro; Nagasono, Mitsuru; Yabashi, Makina; Ishikawa, Tetsuya; Togashi, Tadashi; Takahashi, Eiji J.; Midorikawa, Katsumi; Aoyama, Makoto; Yamakawa, Koichi; Kannari, Fumihiko; Yagishita, Akira

    2012-01-01

    The advantages of SPring-8 Compact SASE Source as a light source for spectroscopic measurements in the extreme ultraviolet (EUV) wavelength region are introduced by referring to our recent study of non-linear photoionization processes of He, in which the absolute two-photon ionization cross sections of He at four different wavelengths in the 54 - 62 nm region were determined using intense pulses of the free-election laser (FEL). In addition, our recent effort to generate intense full-coherent EUV light pulses are introduced, in which significant amplification of the 13th harmonic of ultrashort laser pulses at 800 nm was achieved by FEL seeded with the 13th harmonic. (author)

  15. Wearable energy sources based on 2D materials.

    Science.gov (United States)

    Yi, Fang; Ren, Huaying; Shan, Jingyuan; Sun, Xiao; Wei, Di; Liu, Zhongfan

    2018-05-08

    Wearable energy sources are in urgent demand due to the rapid development of wearable electronics. Besides flexibility and ultrathin thickness, emerging 2D materials present certain extraordinary properties that surpass the properties of conventional materials, which make them advantageous for high-performance wearable energy sources. Here, we provide a comprehensive review of recent advances in 2D material based wearable energy sources including wearable batteries, supercapacitors, and different types of energy harvesters. The crucial roles of 2D materials in the wearable energy sources are highlighted. Based on the current progress, the existing challenges and future prospects are outlined and discussed.

  16. EUV spectrum of highly charged tungsten ions in electron beam ion trap

    International Nuclear Information System (INIS)

    Sakaue, H.A.; Kato, D.; Murakami, I.; Nakamura, N.

    2016-01-01

    We present spectra of highly charged tungsten ions in the extreme ultra-violet (EUV) by using electron beam ion traps. The electron energy dependence of spectra was investigated for electron energy from 540 to 1370 eV. Previously unreported lines were presented in the EUV range, and comparing the wavelengths with theoretical calculations identified them. (author)

  17. Characterization of EUV induced carbon films using laser-generated surface acoustic waves

    NARCIS (Netherlands)

    Chen, Juequan; Lee, Christopher James; Louis, Eric; Bijkerk, Frederik; Kunze, Reinhard; Schmidt, Hagen; Schneider, Dieter; Moors, Roel

    2009-01-01

    The deposition of carbon layers on the surfaces of optics exposed to extreme ultraviolet (EUV) radiation has been observed in EUV lithography. It has become of critical importance to detect the presence of the carbon layer in the order of nanometer thickness due to carbon's extremely strong

  18. EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror

    NARCIS (Netherlands)

    Huang, Qiushi; Louis, Eric; Bijkerk, Frederik; de Boer, Meint J.; von Blanckenhagen, G.

    2016-01-01

    A multilayer mirror (M) reflecting extreme ultraviolet (EUV) radiation from a first wave-length range in a EUV spectral region comprises a substrate (SUB) and a stack of layers (SL) on the substrate, the stack of layers comprising layers comprising a low index material and a high index material, the

  19. Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm

    Energy Technology Data Exchange (ETDEWEB)

    Masnavi, Majid; Szilagyi, John; Parchamy, Homaira; Richardson, Martin C. [The Townes Laser Institute, College of Optics and Photonics, University of Central Florida, 4000 Central Florida Blvd., Orlando, Florida 32816 (United States)

    2013-04-22

    There is increasing interest in extreme-ultraviolet (EUV) laser-based lamps for sub-10-nm lithography operating in the region of 6.6 nm. A collisional-radiative model is developed as a post-processor of a hydrodynamic code to investigate emission from resonance lines in Kr, Gd, and Tb ions under conditions typical for mass-limited EUV sources. The analysis reveals that maximum conversion efficiencies of Kr occur at 5 Multiplication-Sign 10{sup 10}W/cm{sup 2}, while for Gd and Tb it was Asymptotically-Equal-To 0.9%/2{pi}sr for laser intensities of (2-5) Multiplication-Sign 10{sup 12}W/cm{sup 2}.

  20. EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

    Science.gov (United States)

    Putna, E. Steve; Younkin, Todd R.; Leeson, Michael; Caudillo, Roman; Bacuita, Terence; Shah, Uday; Chandhok, Manish

    2011-04-01

    The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. According to recent assessments made at the 2010 EUVL Symposium, the readiness of EUV materials remains one of the top risk items for EUV adoption. The main development issue regarding EUV resists has been how to simultaneously achieve high resolution, high sensitivity, and low line width roughness (LWR). This paper describes our strategy, the current status of EUV materials, and the integrated post-development LWR reduction efforts made at Intel Corporation. Data collected utilizing Intel's Micro- Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <=11.3mJ/cm2 with <=3nm LWR.

  1. Negative-tone imaging with EUV exposure for 14nm hp and beyond

    Science.gov (United States)

    Tsubaki, Hideaki; Nihashi, Wataru; Tsuchihashi, Toru; Fujimori, Toru; Momota, Makoto; Goto, Takahiro

    2015-03-01

    Manipulation of dissolution properties by changing organic solvent developer and rinse material provides a novel technology to obtain fine pattern beyond the limitation of imaging system based on alkaline developer. QCM study showed no swelling character in negative-tone imaging (NTI) process even for current developer of n-butyl acetate (nBA). Actually, NTI process has shown advantages on resolution and line-width roughness (LWR) in loose pitch around 30 ~ 45 nm hp as a consequence of its non-swelling character. On the other hand, bridge and collapse limited its resolution below 20 nm hp, indicating that non-negligible amount of swelling still exists for tight pitch resolution. We investigated effects of solubility parameter of organic solvents on resolution below 20 nm hp. A bridge was reduced with a decrease in the solubility parameter dp from nBA. On the other hand, much lower dp caused film remaining due to its extremely slow Rmax. Based on these results, we newly developed FN-DP301 containing organic solvent with smaller dp than nBA. Although rinse solvent gave negligible effects on bridge, there is a clear improvement on pattern collapse only in case of using new rinse solvent of FN-RP311. Lithographic performances of NTI process using nBA and FN-DP301 together with the other organic solvents were described in this paper under exposures with an E-beam and a EUV light. It is emphasized that 14 nm hp resolution was obtained only using FN-DP301 as a developer and FN-RP311 as a rinse under E-beam exposure. NTI showed 43% faster photospeed in comparison with PTI at 16 nm hp, indicating that NTI is applicable to obtain high throughput with maintaining resolution. In addition, sub-20 nm trench was obtained using NTI without bridge under EUV exposure, all of which are attributed to the low swelling character of NTI process. Similarly, NTI was able to print 20 nm dots using NXE:3100 with only a little peeling. Conversely CH patterning was significantly worse with NTI

  2. Delineation of seismic source zones based on seismicity parameters ...

    Indian Academy of Sciences (India)

    In the present study, an attempt has been made to delineate seismic source zones in the study area (south India) based on the seismicity parameters. Seismicity parameters and the maximum probable earthquake for these source zones were evaluated and were used in the hazard evaluation. The probabilistic evaluation of ...

  3. Fiber-based broadband black-light source

    OpenAIRE

    Sylvestre , Thibaut; Lee , Min Won; Ragueh , A. R.; Stiller , Birgit; Fanjoux , Gil; Barviau , B.; Mussot , A.; Kudlinski , A.

    2012-01-01

    International audience; Black-Light or Wood's lamp refers to sources that emit long-wavelength ultraviolet radiation (UV-A) from 315 nm and little visible light till 410 nm (blue). In this paper, we present a new fibre-based source of "black light", a source that emits broadband ultraviolet radiation but only small amounts of visible light and no infrared light. We made this source by pumping a specially designed silica photonic crystal fibre (PCF) with 355 nm light pulses from a Q-switched f...

  4. Single channel blind source separation based on ICA feature extraction

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    A new technique is proposed to solve the blind source separation (BSS) given only a single channel observation. The basis functions and the density of the coefficients of source signals learned by ICA are used as the prior knowledge. Based on the learned prior information the learning rules of single channel BSS are presented by maximizing the joint log likelihood of the mixed sources to obtain source signals from single observation,in which the posterior density of the given measurements is maximized. The experimental results exhibit a successful separation performance for mixtures of speech and music signals.

  5. New paradigms for Salmonella source attribution based on microbial subtyping.

    NARCIS (Netherlands)

    Mughini-Gras, Lapo; Franz, Eelco; van Pelt, Wilfrid

    Microbial subtyping is the most common approach for Salmonella source attribution. Typically, attributions are computed using frequency-matching models like the Dutch and Danish models based on phenotyping data (serotyping, phage-typing, and antimicrobial resistance profiling). Herewith, we

  6. Uncertainties in (E)UV model atmosphere fluxes

    Science.gov (United States)

    Rauch, T.

    2008-04-01

    Context: During the comparison of synthetic spectra calculated with two NLTE model atmosphere codes, namely TMAP and TLUSTY, we encounter systematic differences in the EUV fluxes due to the treatment of level dissolution by pressure ionization. Aims: In the case of Sirius B, we demonstrate an uncertainty in modeling the EUV flux reliably in order to challenge theoreticians to improve the theory of level dissolution. Methods: We calculated synthetic spectra for hot, compact stars using state-of-the-art NLTE model-atmosphere techniques. Results: Systematic differences may occur due to a code-specific cutoff frequency of the H I Lyman bound-free opacity. This is the case for TMAP and TLUSTY. Both codes predict the same flux level at wavelengths lower than about 1500 Å for stars with effective temperatures (T_eff) below about 30 000 K only, if the same cutoff frequency is chosen. Conclusions: The theory of level dissolution in high-density plasmas, which is available for hydrogen only should be generalized to all species. Especially, the cutoff frequencies for the bound-free opacities should be defined in order to make predictions of UV fluxes more reliable.

  7. Observations and predictions of EUV emission from classical novae

    International Nuclear Information System (INIS)

    Starrfield, S.; Truran, J.W.; Sparks, W.M.; Krautter, J.

    1989-01-01

    Theoretical modeling of novae in outburst predicts that they should be active emitters of radiation both in the EUV and soft X-ray wavelengths twice during the outburst. The first time is very early in the outburst when only an all sky survey can detect them. This period lasts only a few hours. They again become bright EUV and soft X-ray emitters late in the outburst when the remnant object becomes very hot and is still luminous. The predictions imply both that a nova can remain very hot for months to years and that the peak temperature at this time strongly depends upon the mass of the white dwarf. It is important to observe novae at these late times because a measurement of both the flux and temperature can provide information about the mass of the white dwarf, the tun-off time scale, and the energy budget of the outburst. We review the existing observations of novae in late stages of their outburst and present some newly obtained data for GQ Mus 1983. We then provide results of new hydrodynamic simulations of novae in outburst and compare the predictions to the observations. 43 refs., 6 figs

  8. Feasibility of compensating for EUV field edge effects through OPC

    Science.gov (United States)

    Maloney, Chris; Word, James; Fenger, Germain L.; Niroomand, Ardavan; Lorusso, Gian F.; Jonckheere, Rik; Hendrickx, Eric; Smith, Bruce W.

    2014-04-01

    As EUV Lithography (EUVL) continues to evolve, it offers a possible solution to the problems of additional masks and lithography steps that drive up the cost and complexity of 193i multiple patterning. EUVL requires a non-telecentric reflective optical system for operation. This requirement causes EUV specific effects such as shadowing. The absorber physically shadows the reflective multilayer (ML) on an EUV reticle resulting in pattern fidelity degradation. To reduce this degradation, a thinner absorber may help. Yet, as the absorber thickness decreases, reflectivity increases in the `dark' region around the image field, resulting in a loss of contrast. The region around the edge of the die on the mask of unpatterned absorber material deposited on top of ML, known as the image border, is also susceptible to undesirable reflections in an ideally dark region. For EUVL to be enabled for high-volume manufacturing (HVM), reticle masking (REMA) blades are used to shield light from the image border to allow for the printing of densely spaced die. When die are printed densely, the image border of each neighboring die will overlap with the edge of a given die resulting in an increase of dose that overexposes features at the edge of the field. This effect is convolved with a fingerprint from the edge of the REMA blades. This phenomenon will be referred to as a field edge effect. One such mitigation strategy that has been investigated to reduce the field edge effect is to fully remove the ML along the image border to ensure that no actinic-EUV radiation can be reflected onto neighboring die. This has proven to suppress the effect, but residual out-of-band radiation still provides additional dose to features near the image border, especially in the corners where three neighboring fields overlap. Measurements of dense contact holes (CHs) have been made along the image border with and without a ML-etched border at IMEC in collaboration with Micron using the ASML NXE:3100. The

  9. Uncovering New Thermal and Elastic Properties of Nanostructured Materials Using Coherent EUV Light

    Science.gov (United States)

    Hernandez Charpak, Jorge Nicolas

    Advances in nanofabrication have pushed the characteristic dimensions of nanosystems well below 100nm, where physical properties are often significantly different from their bulk counterparts, and accurate models are lacking. Critical technologies such as thermoelectrics for energy harvesting, nanoparticle-mediated thermal therapy, nano-enhanced photovoltaics, and efficient thermal management in integrated circuits depend on our increased understanding of the nanoscale. However, traditional microscopic characterization tools face fundamental limits at the nanoscale. Theoretical efforts to build a fundamental picture of nanoscale thermal dynamics lack experimental validation and still struggle to account for newly reported behaviors. Moreover, precise characterization of the elastic behavior of nanostructured systems is needed for understanding the unique physics that become apparent in small-scale systems, such as thickness-dependent or fabrication-dependent elastic properties. In essence, our ability to fabricate nanosystems has outstripped our ability to understand and characterize them. In my PhD thesis, I present the development and refinement of coherent extreme ultraviolet (EUV) nanometrology, a novel tool used to probe material properties at the intrinsic time- and length-scales of nanoscale dynamics. By extending ultrafast photoacoustic and thermal metrology techniques to very short probing wavelengths using tabletop coherent EUV beams from high-harmonic upconversion (HHG) of femtosecond lasers, coherent EUV nanometrology allows for a new window into nanoscale physics, previously unavailable with traditional techniques. Using this technique, I was able to probe both thermal and acoustic dynamics in nanostructured systems with characteristic dimensions below 50nm with high temporal (sub-ps) and spatial (size and spacing of the nanoscale heat sources with the phonon spectrum of a material. This makes our technique one of the only experimental routes to

  10. Energy-Based Acoustic Source Localization Methods: A Survey

    Directory of Open Access Journals (Sweden)

    Wei Meng

    2017-02-01

    Full Text Available Energy-based source localization is an important problem in wireless sensor networks (WSNs, which has been studied actively in the literature. Numerous localization algorithms, e.g., maximum likelihood estimation (MLE and nonlinear-least-squares (NLS methods, have been reported. In the literature, there are relevant review papers for localization in WSNs, e.g., for distance-based localization. However, not much work related to energy-based source localization is covered in the existing review papers. Energy-based methods are proposed and specially designed for a WSN due to its limited sensor capabilities. This paper aims to give a comprehensive review of these different algorithms for energy-based single and multiple source localization problems, their merits and demerits and to point out possible future research directions.

  11. Spectral lines and characteristic of temporal variations in photoionized plasmas induced with laser-produced plasma extreme ultraviolet source

    Science.gov (United States)

    Saber, I.; Bartnik, A.; Wachulak, P.; Skrzeczanowski, W.; Jarocki, R.; Fiedorowicz, H.

    2017-11-01

    Spectral lines for Kr/Ne/H2 photoionized plasma in the ultraviolet and visible (UV/Vis) wavelength ranges have been created using a laser-produced plasma (LPP) EUV source. The source is based on a double-stream gas puff target irradiated with a commercial Nd:YAG laser. The laser pulses were focused onto a gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Spectral lines from photoionization in neutral Kr/Ne/H2 and up to few charged states were observed. The intense emission lines were associated with the Kr transition lines. Experimental and theoretical investigations on intensity variations for some ionic lines are presented. A decrease in the intensity with the delay time between the laser pulse and the spectrum acquisition was revealed. Electron temperature and electron density in the photoionized plasma have been estimated from the characteristic emission lines. Temperature was obtained using Boltzmann plot method, assuming that the population density of atoms and ions are considered in a local thermodynamic equilibrium (LTE). Electron density was calculated from the Stark broadening profile. The temporal evaluation of the plasma and the way of optimizing the radiation intensity of LPP EUV sources is discussed.

  12. Surface Inhomogeneities of the White Dwarf in the Binary EUVE J2013+400

    Science.gov (United States)

    Vennes, Stephane

    We propose to study the white dwarf in the binary EUVE J2013+400. The object is paired with a dMe star and new extreme ultraviolet (EUV) observations will offer critical insights into the properties of the white dwarf. The binary behaves, in every other aspects, like its siblings EUVE J0720-317 and EUVE J1016-053 and new EUV observations will help establish their class properties; in particular, EUV photometric variations in 0720-317 and 1016-053 over a period of 11 hours and 57 minutes, respectively, are indicative of surface abundance inhomogeneities coupled with the white dwarfs rotation period. These variations and their large photospheric helium abundance are best explained by a diffusion-accretion model in which time-variable accretion and possible coupling to magnetic poles contribute to abundance variations across the surface and possibly as a function of depth. EUV spectroscopy will also enable a study of the helium abundance as a function of depth and a detailed comparison with theoretical diffusion profile.

  13. Evidence for a New Class of Extreme Ultraviolet Sources

    Science.gov (United States)

    Maoz, Dan; Ofek, Eran O.; Shemi, Amotz

    1997-01-01

    Most of the sources detected in the extreme ultraviolet (EUV; 100-600 A) by the ROSAT/WFC and EUVE all-sky surveys have been identified with active late-type stars and hot white dwarfs that are near enough to the Earth to escape absorption by interstellar gas. However, about 15 per cent of EUV sources are as yet unidentified with any optical counterparts. We examine whether the unidentified EUV sources may consist of the same population of late-type stars and white dwarfs. We present B and R photometry of stars in the fields of seven of the unidentified EUV sources. We detect in the optical the entire main-sequence and white dwarf population out to the greatest distances where they could still avoid absorption. We use color-magnitude diagrams to demonstrate that, in most of the fields, none of the observed stars has the colours and magnitudes of late-type dwarfs at distances less than 100 pc. Similarly, none of the observed stars is a white dwarf within 500 pc that is hot enough to be a EUV emitter. The unidentified EUV sources we study are not detected in X-rays, while cataclysmic variables, X-ray binaries, and active galactic nuclei generally are. We conclude that some of the EUV sources may be a new class of nearby objects, which are either very faint at optical bands or which mimic the colours and magnitudes of distant late-type stars or cool white dwarfs. One candidate for optically faint objects is isolated old neutron stars, slowly accreting interstellar matter. Such neutron stars are expected to be abundant in the Galaxy, and have not been unambiguously detected.

  14. Research sources of ionizing radiation based on transplutonium elements

    Science.gov (United States)

    Radchenko, V. M.; Ryabinin, M. A.

    2010-03-01

    Scientific and technical demand stimulates an extension of the practical implementation field of TPE, requirements to their ecological safety calling for the development of such materials which could be most resistant to the environment and most suitable for the production of a wide range of sources different in their application and design. Such materials can involve pure metals of transplutonium elements and their alloys with metals of platinum group as well as their chemically stable compounds (such as silicides, carbides etc.) At SSC RIAR production processes of sources of different type and application have been implemented. Examples of the most recent developments of the sources are presented below. Presented is the analysis of the current state of issues related to designing, production and application of radionuclide research sources based on transplutonium elements. Examples of the development of the most up-to-date sources of alpha-, gamma- and neutron radiation and also fission ones are considered.

  15. Capillary discharge sources of hard UV radiation

    International Nuclear Information System (INIS)

    Cachoncinlle, C; Dussart, R; Robert, E; Goetze, S; Pons, J; Mohanty, S R; Viladrosa, R; Fleurier, C; Pouvesle, J M

    2002-01-01

    We developed and studied three different extreme ultraviolet (EUV) capillary discharge sources either dedicated to the generation of coherent or incoherent EUV radiation. The CAPELLA source has been developed especially as an EUV source for the metrology at 13.4 nm. With one of these sources, we were able to produce gain on the Balmer-Hα (18.22 nm) and Hβ (13.46 nm) spectral lines in carbon plasma. By injecting 70 GW cm -3 we measured gain-length products up to 1.62 and 3.02 for the Hα and Hβ, respectively optimization of the EUV capillary source CAPELLA led to the development of an EUV lamp which emits 2 mJ in the bandwidth of the MoSi mirror, per joule stored, per shot and in full solid angle. The wall-plug efficiency is 0.2%. Stability of this lamp is better than 4% and the lamp can operate at repetition rate of 50 Hz

  16. Extending CO2 cryogenic aerosol cleaning for advanced optical and EUV mask cleaning

    Science.gov (United States)

    Varghese, Ivin; Bowers, Charles W.; Balooch, Mehdi

    2011-11-01

    Cryogenic CO2 aerosol cleaning being a dry, chemically-inert and residue-free process is used in the production of optical lithography masks. It is an attractive cleaning option for the mask industry to achieve the requirement for removal of all printable soft defects and repair debris down to the 50nm printability specification. In the technique, CO2 clusters are formed by sudden expansion of liquid from high to almost atmospheric pressure through an optimally designed nozzle orifice. They are then directed on to the soft defects or debris for momentum transfer and subsequent damage free removal from the mask substrate. Unlike aggressive acid based wet cleaning, there is no degradation of the mask after processing with CO2, i.e., no critical dimension (CD) change, no transmission/phase losses, or chemical residue that leads to haze formation. Therefore no restriction on number of cleaning cycles is required to be imposed, unlike other cleaning methods. CO2 aerosol cleaning has been implemented for several years as full mask final clean in production environments at several state of the art mask shops. Over the last two years our group reported successful removal of all soft defects without damage to the fragile SRAF features, zero adders (from the cleaning and handling mechanisms) down to a 50nm printability specification. In addition, CO2 aerosol cleaning is being utilized to remove debris from Post-RAVE repair of hard defects in order to achieve the goal of no printable defects. It is expected that CO2 aerosol cleaning can be extended to extreme ultraviolet (EUV) masks. In this paper, we report advances being made in nozzle design qualification for optimum snow properties (size, velocity and flux) using Phase Doppler Anemometry (PDA) technique. In addition the two new areas of focus for CO2 aerosol cleaning i.e. pellicle glue residue removal on optical masks, and ruthenium (Ru) film on EUV masks are presented. Usually, the residue left over after the pellicle

  17. Permanent magnet based dipole magnets for next generation light sources

    Directory of Open Access Journals (Sweden)

    Takahiro Watanabe

    2017-07-01

    Full Text Available We have developed permanent magnet based dipole magnets for the next generation light sources. Permanent magnets are advantageous over electromagnets in that they consume less power, are physically more compact, and there is a less risk of power supply failure. However, experience with electromagnets and permanent magnets in the field of accelerators shows that there are still challenges to replacing main magnets of accelerators for light sources with permanent magnets. These include the adjustability of the magnetic field, the temperature dependence of permanent magnets, and the issue of demagnetization. In this paper, we present a design for magnets for future light sources, supported by experimental and numerical results.

  18. Six transformer based asymmetrical embedded Z-source inverters

    DEFF Research Database (Denmark)

    Wei, Mo; Poh Chiang, Loh; Chi, Jin

    2013-01-01

    Embedded/Asymmetrical embedded Z-source inverters were proposed to maintain smooth input current/voltage across the dc source and within the impedance network, remain the shoot-through feature used to boost up the dc-link voltage without adding bulky filter at input side. This paper introduces a ...... a class of transformer based asymmetrical embedded Z-source inverters which keep the smooth input current and voltage while achieving enhanced voltage boost capability. The presented inverters are verified by laboratory prototypes experimentally....

  19. New paradigms for Salmonella source attribution based on microbial subtyping.

    Science.gov (United States)

    Mughini-Gras, Lapo; Franz, Eelco; van Pelt, Wilfrid

    2018-05-01

    Microbial subtyping is the most common approach for Salmonella source attribution. Typically, attributions are computed using frequency-matching models like the Dutch and Danish models based on phenotyping data (serotyping, phage-typing, and antimicrobial resistance profiling). Herewith, we critically review three major paradigms facing Salmonella source attribution today: (i) the use of genotyping data, particularly Multi-Locus Variable Number of Tandem Repeats Analysis (MLVA), which is replacing traditional Salmonella phenotyping beyond serotyping; (ii) the integration of case-control data into source attribution to improve risk factor identification/characterization; (iii) the investigation of non-food sources, as attributions tend to focus on foods of animal origin only. Population genetics models or simplified MLVA schemes may provide feasible options for source attribution, although there is a strong need to explore novel modelling options as we move towards whole-genome sequencing as the standard. Classical case-control studies are enhanced by incorporating source attribution results, as individuals acquiring salmonellosis from different sources have different associated risk factors. Thus, the more such analyses are performed the better Salmonella epidemiology will be understood. Reparametrizing current models allows for inclusion of sources like reptiles, the study of which improves our understanding of Salmonella epidemiology beyond food to tackle the pathogen in a more holistic way. Copyright © 2017 Elsevier Ltd. All rights reserved.

  20. Plagiarism and Source Deception Detection Based on Syntax Analysis

    Directory of Open Access Journals (Sweden)

    Eman Salih Al-Shamery

    2017-02-01

    Full Text Available In this research, the shingle algorithm with Jaccard method are employed as a new approach to detect deception in sources in addition to detect plagiarism . Source deception occurs as a result of taking a particular text from a source and relative it to another source, while plagiarism occurs in the documents as a result of taking part or all of the text belong to another research, this approach is based on Shingle algorithm with Jaccard coefficient , Shingling is an efficient way to compare the set of shingle in the files that contain text which are used as a feature to measure the syntactic similarity of the documents and it will work with Jaccard coefficient that measures similarity between sample sets . In this proposed system, text will be checked whether it contains syntax plagiarism or not and gives a percentage of similarity with other documents , As well as research sources will be checked to detect deception in source , by matching it with available sources from Turnitin report of the same research by using shingle algorithm with Jaccard coefficient. The motivations of this work is to discovery of literary thefts that occur on the researches , especially what students are doing in their researches , also discover the deception that occurs in the sources.

  1. Rocket-borne EUV-visible emission measurements

    International Nuclear Information System (INIS)

    Schmidtke, G.; Baker, K.D.; Stasek, G.

    1982-01-01

    Two rocket-borne experiments for measuring EUV atmospheric emissions have been conducted. The first measured emissions at 391.4 nm and 557.7 nm, and the second measured emissions in the range from 50 to 650 nm. Height profiles of selected auroral emissions from atomic oxygen at 130.4 nm (exhibiting resonant radiation diffusion) and from atomic oxygen at 557.7 nm, and from neutral and ionized molecular nitrogen are shown. Some details of the recorded spectra are given. In the shorter wavelength regions, emissions from atomic oxygen and nitrogen dominate. Over 140 nm, Lyman-Birge-Hopfield bands, second positive bands and Vegard-Kaplan bands of molecular nitrogen contribute most strongly except for some atomic lines. The Lyman-Birge-Hopfield bands of molecular nitrogen are relatively weak during the auroral arc as compared to the diffuse aurora

  2. Impulsive EUV bursts observed in C IV with OSO-8

    International Nuclear Information System (INIS)

    Grant Athay, R.; White, O.R.; Lites, B.W.

    1980-01-01

    Time sequences of profiles of the lambda 1548 line of C IV containing 51 EUV bursts observed in or near active regions are analyzed to determine the brightness. Doppler shift and line broadening characteristics of the bursts. The bursts have mean lifetimes of approximately 150s, and mean increases in brightness at burst maximum of four-fold as observed with a field of view of 2'' x 20''. Mean burst diameters are estimated to be 3'', or smaller. All but three of the bursts show Doppler shift with velocities sometimes exceeding 75 km s -1 ; 31 are dominated by red shifts and 17 are dominated by blue shifts. Approximately half of the latter group have red-shifted precursors. We interpret the bursts as prominence material, such as surges and coronal rain, moving through the field of view of the spectrometer. (orig.)

  3. Actinic inspection of EUV reticles with arbitrary pattern design

    Science.gov (United States)

    Mochi, Iacopo; Helfenstein, Patrick; Rajeev, Rajendran; Fernandez, Sara; Kazazis, Dimitrios; Yoshitake, Shusuke; Ekinci, Yasin

    2017-10-01

    The re ective-mode EUV mask scanning lensless imaging microscope (RESCAN) is being developed to provide actinic mask inspection capabilities for defects and patterns with high resolution and high throughput, for 7 nm node and beyond. Here we, will report on our progress and present the results on programmed defect detection on random, logic-like patterns. The defects we investigated range from 200 nm to 50 nm size on the mask. We demonstrated the ability of RESCAN to detect these defects in die-to-die and die-to-database mode with a high signal to noise ratio. We also describe future plans for the upgrades to increase the resolution, the sensitivity, and the inspection speed of the demo tool.

  4. Very high flux steady state reactor and accelerator based sources

    International Nuclear Information System (INIS)

    Ludewig, H.; Todosow, M.; Simos, N.; Shapiro, S.; Hastings, J.

    2004-01-01

    With the number of steady state neutron sources in the US declining (including the demise of the Bnl HFBR) the remaining intense sources are now in Europe (i.e. reactors - ILL and FMR, accelerator - PSI). The intensity of the undisturbed thermal flux for sources currently in operation ranges from 10 14 n/cm 2 *s to 10 15 n/cm 2 *s. The proposed Advanced Neutron Source (ANS) was to be a high power reactor (about 350 MW) with a projected undisturbed thermal flux of 7*10 15 n/cm 2 *s but never materialized. The objective of the current study is to explore the requirements and implications of two source concepts with an undisturbed flux of 10 16 n/cm 2 *s. The first is a reactor based concept operating at high power density (10 MW/l - 15 MW/l) and a total power of 100 MW - 250 MW, depending on fissile enrichment. The second is an accelerator based concept relying on a 1 GeV - 1.5 GeV proton Linac with a total beam power of 40 MW and a liquid lead-bismuth eutectic target. In the reactor source study, the effects of fissile material enrichment, coolant temperature and pressure drop, and estimates of pressure vessel stress levels will be investigated. The fuel form for the reactor will be different from all other operating source reactors in that it is proposed to use an infiltrated graphitic structure, which has been developed for nuclear thermal propulsion reactor applications. In the accelerator based source the generation of spallation products and their activation levels, and the material damage sustained by the beam window will be investigated. (authors)

  5. Performance evaluation of a permanent ring magnet based helicon plasma source for negative ion source research

    Science.gov (United States)

    Pandey, Arun; Bandyopadhyay, M.; Sudhir, Dass; Chakraborty, A.

    2017-10-01

    Helicon wave heated plasmas are much more efficient in terms of ionization per unit power consumed. A permanent magnet based compact helicon wave heated plasma source is developed in the Institute for Plasma Research, after carefully optimizing the geometry, the frequency of the RF power, and the magnetic field conditions. The HELicon Experiment for Negative ion-I source is the single driver helicon plasma source that is being studied for the development of a large sized, multi-driver negative hydrogen ion source. In this paper, the details about the single driver machine and the results from the characterization of the device are presented. A parametric study at different pressures and magnetic field values using a 13.56 MHz RF source has been carried out in argon plasma, as an initial step towards source characterization. A theoretical model is also presented for the particle and power balance in the plasma. The ambipolar diffusion process taking place in a magnetized helicon plasma is also discussed.

  6. Etch bias inversion during EUV mask ARC etch

    Science.gov (United States)

    Lajn, Alexander; Rolff, Haiko; Wistrom, Richard

    2017-07-01

    The introduction of EUV lithography to high volume manufacturing is now within reach for 7nm technology node and beyond (1), at least for some steps. The scheduling is in transition from long to mid-term. Thus, all contributors need to focus their efforts on the production requirements. For the photo mask industry, these requirements include the control of defectivity, CD performance and lifetime of their masks. The mask CD performance including CD uniformity, CD targeting, and CD linearity/ resolution, is predominantly determined by the photo resist performance and by the litho and etch processes. State-of-the-art chemically amplified resists exhibit an asymmetric resolution for directly and indirectly written features, which usually results in a similarly asymmetric resolution performance on the mask. This resolution gap may reach as high as multiple tens of nanometers on the mask level in dependence of the chosen processes. Depending on the printing requirements of the wafer process, a reduction or even an increase of this gap may be required. A potential way of tuning via the etch process, is to control the lateral CD contribution during etch. Aside from process tuning knobs like pressure, RF powers and gases, which usually also affect CD linearity and CD uniformity, the simplest knob is the etch time itself. An increased over etch time results in an increased CD contribution in the normal case. , We found that the etch CD contribution of ARC layer etch on EUV photo masks is reduced by longer over etch times. Moreover, this effect can be demonstrated to be present for different etch chambers and photo resists.

  7. Analysis of a Failed Eclipse Plasma Ejection Using EUV Observations

    Science.gov (United States)

    Tavabi, E.; Koutchmy, S.; Bazin, C.

    2018-03-01

    The photometry of eclipse white-light (W-L) images showing a moving blob is interpreted for the first time together with observations from space with the PRoject for On Board Autonomy (PROBA-2) mission (ESA). An off-limb event seen with great details in W-L was analyzed with the SWAP imager ( Sun Watcher using Active pixel system detector and image Processing) working in the EUV near 174 Å. It is an elongated plasma blob structure of 25 Mm diameter moving above the east limb with coronal loops under. Summed and co-aligned SWAP images are evaluated using a 20-h sequence, in addition to the 11 July, 2010 eclipse W-L images taken from several sites. The Atmospheric Imaging Assembly (AIA) instrument on board the Solar Dynamics Observatory (SDO) recorded the event suggesting a magnetic reconnection near a high neutral point; accordingly, we also call it a magnetic plasmoid. The measured proper motion of the blob shows a velocity up to 12 km s^{-1}. Electron densities of the isolated condensation (cloud or blob or plasmoid) are photometrically evaluated. The typical value is 108 cm^{-3} at r=1.7 R_{⊙}, superposed on a background corona of 107 cm^{-3} density. The mass of the cloud near its maximum brightness is found to be 1.6×10^{13} g, which is typically 0.6×10^{-4} of the overall mass of the corona. From the extrapolated magnetic field the cloud evolves inside a rather broad open region but decelerates, after reaching its maximum brightness. The influence of such small events for supplying material to the ubiquitous slow wind is noticed. A precise evaluation of the EUV photometric data, after accurately removing the stray light, suggests an interpretation of the weak 174 Å radiation of the cloud as due to resonance scattering in the Fe IX/X lines.

  8. Sources of the X-rays Based on Compton Scattering

    International Nuclear Information System (INIS)

    Androsov, V.; Bulyak, E.; Gladkikh, P.; Karnaukhov, I.; Mytsykov, A.; Telegin, Yu.; Shcherbakov, A.; Zelinsky, A.

    2007-01-01

    The principles of the intense X-rays generation by laser beam scattering on a relativistic electron beam are described and description of facilities assigned to produce the X-rays based on Compton scattering is presented. The possibilities of various types of such facilities are estimated and discussed. The source of the X-rays based on a storage ring with low beam energy is described in details and advantages of the sources of such type are discussed.The results of calculation and numerical simulation carried out for laser electron storage ring NESTOR that is under development in NSC KIPT show wide prospects of the accelerator facility of such type

  9. SOLAR SOURCES OF 3He-RICH SOLAR ENERGETIC PARTICLE EVENTS IN SOLAR CYCLE 24

    International Nuclear Information System (INIS)

    Nitta, Nariaki V.; Mason, Glenn M.; Wang, Linghua; Cohen, Christina M. S.; Wiedenbeck, Mark E.

    2015-01-01

    Using high-cadence EUV images obtained by the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory, we investigate the solar sources of 26 3 He-rich solar energetic particle events at ≲1 MeV nucleon −1 that were well-observed by the Advanced Composition Explorer during solar cycle 24. Identification of the solar sources is based on the association of 3 He-rich events with type III radio bursts and electron events as observed by Wind. The source locations are further verified in EUV images from the Solar and Terrestrial Relations Observatory, which provides information on solar activities in the regions not visible from the Earth. Based on AIA observations, 3 He-rich events are not only associated with coronal jets as emphasized in solar cycle 23 studies, but also with more spatially extended eruptions. The properties of the 3 He-rich events do not appear to be strongly correlated with those of the source regions. As in the previous studies, the magnetic connection between the source region and the observer is not always reproduced adequately by the simple potential field source surface model combined with the Parker spiral. Instead, we find a broad longitudinal distribution of the source regions extending well beyond the west limb, with the longitude deviating significantly from that expected from the observed solar wind speed

  10. Off-limb EUV observations of the solar corona and transients with the CORONAS-F/SPIRIT telescope-coronagraph

    Directory of Open Access Journals (Sweden)

    V. Slemzin

    2008-10-01

    Full Text Available The SPIRIT telescope aboard the CORONAS-F satellite (in orbit from 26 July 2001 to 5 December 2005, observed the off-limb solar corona in the 175 Å (Fe IX, X and XI lines and 304 Å (He II and Si XI lines bands. In the coronagraphic mode the mirror was tilted to image the corona at the distance of 1.1...5 Rsun from the solar center, the outer occulter blocked the disk radiation and the detector sensitivity was enhanced. This intermediate region between the fields of view of ordinary extreme-ultraviolet (EUV telescopes and most of the white-light (WL coronagraphs is responsible for forming the streamer belt, acceleration of ejected matter and emergence of slow and fast solar wind. We present here the results of continuous coronagraphic EUV observations of the solar corona carried out during two weeks in June and December 2002. The images showed a "diffuse" (unresolved component of the corona seen in both bands, and non-radial, ray-like structures seen only in the 175 Å band, which can be associated with a streamer base. The correlations between latitudinal distributions of the EUV brightness in the corona and at the limb were found to be high in 304 Å at all distances and in 175 Å only below 1.5 Rsun. The temporal correlation of the coronal brightness along the west radial line, with the brightness at the underlying limb region was significant in both bands, independent of the distance. On 2 February 2003 SPIRIT observed an expansion of a transient associated with a prominence eruption seen only in the 304 Å band. The SPIRIT data have been compared with the corresponding data of the SOHO LASCO, EIT and UVCS instruments.

  11. LED-based UV source for monitoring spectroradiometer properties

    Science.gov (United States)

    Sildoja, Meelis-Mait; Nevas, Saulius; Kouremeti, Natalia; Gröbner, Julian; Pape, Sven; Pendsa, Stefan; Sperfeld, Peter; Kemus, Fabian

    2018-06-01

    A compact and stable UV monitoring source based on state-of-the-art commercially available ultraviolet light emitting diodes (UV-LEDs) has been developed. It is designed to trace the radiometric stability—both responsivity and wavelength scale—of array spectroradiometers measuring direct solar irradiance in the wavelength range between 300 nm and 400 nm. The spectral irradiance stability of the UV-LED-based light source observed in the laboratory after seasoning (burning-in) the individual LEDs was better than 0.3% over a 12 h period of continuous operation. The integral irradiance measurements of the source over a period of several months, where the UV-LED source was not operated continuously between the measurements, showed stability within 0.3%. In-field measurements of the source with an array spectroradiometer indicated the stability of the source to be within the standard uncertainty of the spectroradiometer calibration, which was within 1% to 2%.

  12. Radioactive source monitoring system based on RFID and GPRS

    International Nuclear Information System (INIS)

    He Haiyang; Zhou Hongliang; Zhang Hongjian; Zhang Sheng; Zhou Junru; Weng Guojie

    2011-01-01

    Nuclear radiation produced by radioactive source is harmful to the health of human body, and the lost and theft of radioactive source will cause environmental pollution and social panic. In order to solve the abnormal leaks, accidental loss, theft and other problems of the radioactive source, a radioactive source monitoring system based on RFID, GPS, GPRS and GSM technology is put forward. Radiation dose detector and GPS wireless location module are used to obtain the information of radiation dose and location respectively, RFID reader reads the status of a tag fixed on the bottom of the radioactive source. All information is transmitted to the remote monitoring center via GPRS wireless transmission. There will be an audible and visual alarm when radiation dose is out of limits or the state of radioactive source is abnormal, and the monitoring center will send alarming text messages to the managers through GSM Modem at the same time. Thus, the functions of monitoring and alarming are achieved. The system has already been put into operation and is being kept in functional order. It can provide stable statistics as well as accurate alarm, improving the supervision of radioactive source effectively. (authors)

  13. High power pulsed sources based on fiber amplifiers

    Science.gov (United States)

    Canat, Guillaume; Jaouën, Yves; Mollier, Jean-Claude; Bouzinac, Jean-Pierre; Cariou, Jean-Pierre

    2017-11-01

    Cladding-pumped rare-earth-doped fiber laser technologies are currently among the best sources for high power applications. Theses extremely compact and robust sources appoint them as good candidate for aeronautical and space applications. The double-clad (DC) fiber converts the poor beamquality of high-power large-area pump diodes from the 1st cladding to laser light at another wavelength guided in an active single-mode core. High-power coherent MOPA (Master Oscillator Power Amplifier) sources (several 10W CW or several 100W in pulsed regime) will soon be achieved. Unfortunately it also brings nonlinear effects which quickly impairs output signal distortions. Stimulated Brillouin scattering (SBS) and optical parametric amplification (OPA) have been shown to be strong limitations. Based on amplifier modeling and experiments we discuss the performances of these sources.

  14. EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

    Science.gov (United States)

    Putna, E. Steve; Younkin, Todd R.; Chandhok, Manish; Frasure, Kent

    2009-03-01

    The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 32nm half-pitch node and beyond. Readiness of EUV materials is currently one high risk area according to assessments made at the 2008 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data is presented utilizing Intel's Micro-Exposure Tool (MET) examining the feasibility of establishing a resist process that simultaneously exhibits <=30nm half-pitch (HP) L/S resolution at <=10mJ/cm2 with <=4nm LWR.

  15. Mix-and-match considerations for EUV insertion in N7 HVM

    Science.gov (United States)

    Chen, Xuemei; Gabor, Allen; Samudrala, Pavan; Meyers, Sheldon; Hosler, Erik; Johnson, Richard; Felix, Nelson

    2017-03-01

    An optimal mix-match control strategy for EUV and 193i scanners is crucial for the insertion of EUV lithography at 7nm technology node. The systematic differences between these exposure systems introduce additional cross-platform mixmatch overlay errors. In this paper, we quantify the EUV specific contributions to mix-match overlay, and explore the effectiveness of higher-order interfield and intrafield corrections on minimizing the on-product mix-match overlay errors. We also analyze the impact of intra-field sampling plans in terms of model accuracy and adequacy in capturing EUV specific intra-field signatures. Our analysis suggests that more intra-field measurements and appropriate placement of the metrology targets within the field are required to achieve the on-product overlay control goals for N7 HVM.

  16. Calculations of accelerator-based neutron sources characteristics

    International Nuclear Information System (INIS)

    Tertytchnyi, R.G.; Shorin, V.S.

    2000-01-01

    Accelerator-based quasi-monoenergetic neutron sources (T(p,n), D(d;n), T(d;n) and Li (p,n)-reactions) are widely used in experiments on measuring the interaction cross-sections of fast neutrons with nuclei. The present work represents the code for calculation of the yields and spectra of neutrons generated in (p, n)- and ( d; n)-reactions on some targets of light nuclei (D, T; 7 Li). The peculiarities of the stopping processes of charged particles (with incident energy up to 15 MeV) in multilayer and multicomponent targets are taken into account. The code version is made in terms of the 'SOURCE,' a subroutine for the well-known MCNP code. Some calculation results for the most popular accelerator- based neutron sources are given. (authors)

  17. Enhancement of EUV emission from a liquid microjet target by use of dual laser pulses

    Science.gov (United States)

    Higashiguchi, Takeshi; Rajyaguru, Chirag; Koga, Masato; Kawasaki, Keita; Sasaki, Wataru; Kubodera, Shoichi; Kikuchi, Takashi; Yugami, Noboru; Kawata, Shigeo; Andreev, Alexander A.

    2005-03-01

    Extreme ultraviolet (EUV) radiation at the wavelength of around 13nm waws observed from a laser-produced plasma using continuous water-jet. Strong dependence of the conversion efficiency (CE) on the laser focal spot size and jet diameter was observed. The EUV CE at a given laser spot size and jet diameter was further enhanced using double laser pulses, where a pre-pulse was used for initial heating of the plasma.

  18. Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

    KAUST Repository

    Kryask, Marie

    2013-01-01

    Hybrid nanoparticle photoresists and their patterning using DUV, EUV, 193 nm lithography and e-beam lithography has been investigated and reported earlier. The nanoparticles have demonstrated very high EUV sensitivity and significant etch resistance compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass loss and dissolution studies support the current model. © 2013SPST.

  19. High brightness single photon sources based on photonic wires

    DEFF Research Database (Denmark)

    Claudon, J.; Bleuse, J.; Bazin, M.

    2009-01-01

    We present a novel single-photon-source based on the emission of a semiconductor quantum dot embedded in a single-mode photonic wire. This geometry ensures a very large coupling (> 95%) of the spontaneous emission to the guided mode. Numerical simulations show that a photon collection efficiency...

  20. Production of effective microorganism using halal based sources: A ...

    African Journals Online (AJOL)

    Malaysia is recognized as a modern Islamic country; citizens have concerns regarding halal issues associated with EM ingredients, which are not clearly mentioned by the manufacturer. Hence, a halal-based source is suggested in the utilization of EM technology. This study presents the development and applications of ...

  1. Security Vulnerabilities of the Web Based Open Source Information ...

    African Journals Online (AJOL)

    This paper exposes security vulnerabilities of the web based Open Source Information Systems (OSIS) from both system angle and human perspectives.It shows the extent of risk that can likely hinder adopting organization from attaning full intended benefits of using OSIS software. To undertake this study, a case study ...

  2. A silicon-based electrical source for surface plasmon polaritons

    NARCIS (Netherlands)

    Walters, Robert J.; van Loon, Rob V.A.; Brunets, I.; Schmitz, Jurriaan; Polman, Albert

    2009-01-01

    This work demonstrates the fabrication of a silicon-based electrical source for surface plasmon polaritons (SPPs) at low temperatures using silicon nanocrystal doped alumina within a metal-insulator-metal (MIM) waveguide geometry. The fabrication method uses established microtechnology processes

  3. Towards Evidence-Based Understanding of Electronic Data Sources

    DEFF Research Database (Denmark)

    Chen, Lianping; Ali Babar, Muhammad; Zhang, He

    2010-01-01

    Identifying relevant papers from various Electronic Data Sources (EDS) is one of the key activities of conducting these kinds of studies. Hence, the selection of EDS for searching the potentially relevant papers is an important decision, which can affect a study’s coverage of relevant papers...... the two studies and that from literature to provide initial evidence-based heuristics for EDS selection....

  4. Production of effective microorganism using halal- based sources: A ...

    African Journals Online (AJOL)

    GREGORY

    2011-12-16

    Dec 16, 2011 ... Key words: Component, effective microorganisms (EM), agriculture, halal-based source. INTRODUCTION. In recent years, with focus on feeding a rapidly growing human population, Malaysia has jeopardized the environ- ment and its natural resources, which are already under great stress. Consequently ...

  5. Comprehension and Writing Strategy Training Improves Performance on Content-Specific Source-Based Writing Tasks

    Science.gov (United States)

    Weston-Sementelli, Jennifer L.; Allen, Laura K.; McNamara, Danielle S.

    2018-01-01

    Source-based essays are evaluated both on the quality of the writing and the content appropriate interpretation and use of source material. Hence, composing a high-quality source-based essay (an essay written based on source material) relies on skills related to both reading (the sources) and writing (the essay) skills. As such, source-based…

  6. Accelerator-based neutron source and its future

    International Nuclear Information System (INIS)

    Kiyanagi, Yoshiaki

    2008-01-01

    Neutrons are useful tool for the material science and also for the industrial applications. Now, high intensity neutron sources based on MW class big accelerators are under commissioning in Japan, Japan Spallation Neutron Source (JSNS) at J-PARC and in the US, SNS. Such high power neutron sources required the moderators that can be used under high radiation field and also give high neutronic performance. We have been performing experimental and Monte Carlo simulation studies to develop the cold neutron moderator systems for the high power sources since it is becoming important for materials and life science. Hydrogen is the unique candidate at the present stage due to its high resistibility to the radiation. It was indicated the para hydrogen moderator gave a good neutronic performance by experimental results. On the other hand, in the future, low power neutron sources are recognized to be useful to perform sprouting experiments and to promote the neutron science. The moderator systems need a concept different from the high power source. Therefore, we studied neutronic performances of the mesitylene and the methane moderators to get high intensity in a definite area on the moderator surface. Single groove moderators were studied and optimal geometry and the intensity gain were obtained. The mesitylene moderator gave a rather good performance compared to the methane moderator. (author)

  7. Open Source Cloud-Based Technologies for Bim

    Science.gov (United States)

    Logothetis, S.; Karachaliou, E.; Valari, E.; Stylianidis, E.

    2018-05-01

    This paper presents a Cloud-based open source system for storing and processing data from a 3D survey approach. More specifically, we provide an online service for viewing, storing and analysing BIM. Cloud technologies were used to develop a web interface as a BIM data centre, which can handle large BIM data using a server. The server can be accessed by many users through various electronic devices anytime and anywhere so they can view online 3D models using browsers. Nowadays, the Cloud computing is engaged progressively in facilitating BIM-based collaboration between the multiple stakeholders and disciplinary groups for complicated Architectural, Engineering and Construction (AEC) projects. Besides, the development of Open Source Software (OSS) has been rapidly growing and their use tends to be united. Although BIM and Cloud technologies are extensively known and used, there is a lack of integrated open source Cloud-based platforms able to support all stages of BIM processes. The present research aims to create an open source Cloud-based BIM system that is able to handle geospatial data. In this effort, only open source tools will be used; from the starting point of creating the 3D model with FreeCAD to its online presentation through BIMserver. Python plug-ins will be developed to link the two software which will be distributed and freely available to a large community of professional for their use. The research work will be completed by benchmarking four Cloud-based BIM systems: Autodesk BIM 360, BIMserver, Graphisoft BIMcloud and Onuma System, which present remarkable results.

  8. OPEN SOURCE CLOUD-BASED TECHNOLOGIES FOR BIM

    Directory of Open Access Journals (Sweden)

    S. Logothetis

    2018-05-01

    Full Text Available This paper presents a Cloud-based open source system for storing and processing data from a 3D survey approach. More specifically, we provide an online service for viewing, storing and analysing BIM. Cloud technologies were used to develop a web interface as a BIM data centre, which can handle large BIM data using a server. The server can be accessed by many users through various electronic devices anytime and anywhere so they can view online 3D models using browsers. Nowadays, the Cloud computing is engaged progressively in facilitating BIM-based collaboration between the multiple stakeholders and disciplinary groups for complicated Architectural, Engineering and Construction (AEC projects. Besides, the development of Open Source Software (OSS has been rapidly growing and their use tends to be united. Although BIM and Cloud technologies are extensively known and used, there is a lack of integrated open source Cloud-based platforms able to support all stages of BIM processes. The present research aims to create an open source Cloud-based BIM system that is able to handle geospatial data. In this effort, only open source tools will be used; from the starting point of creating the 3D model with FreeCAD to its online presentation through BIMserver. Python plug-ins will be developed to link the two software which will be distributed and freely available to a large community of professional for their use. The research work will be completed by benchmarking four Cloud-based BIM systems: Autodesk BIM 360, BIMserver, Graphisoft BIMcloud and Onuma System, which present remarkable results.

  9. High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

    Science.gov (United States)

    Takei, Satoshi; Hanabata, Makoto; Oshima, Akihiro; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi

    2015-03-01

    We investigated the eco-friendly electron beam (EB) and extreme-ultraviolet (EUV) lithography using a high-sensitive negative type of green resist material derived from biomass to take advantage of organic solvent-free water spin-coating and tetramethylammonium hydroxide(TMAH)-free water-developable techniques. A water developable, non-chemically amplified, high sensitive, and negative tone resist material in EB lithography was developed for environmental affair, safety, easiness of handling, and health of the working people, instead of the common developable process of TMAH. The material design concept to use the water-soluble resist material with acceptable properties such as pillar patterns with less than 100 nm in high EB sensitivity of 10 μC/cm2 and etch selectivity with a silicon-based middle layer in CF4 plasma treatment was demonstrated for EB and EUV lithography.

  10. Low-debris, efficient laser-produced plasma extreme ultraviolet source by use of a regenerative liquid microjet target containing tin dioxide (SnO2) nanoparticles

    Science.gov (United States)

    Higashiguchi, Takeshi; Dojyo, Naoto; Hamada, Masaya; Sasaki, Wataru; Kubodera, Shoichi

    2006-05-01

    We demonstrated a low-debris, efficient laser-produced plasma extreme ultraviolet (EUV) source by use of a regenerative liquid microjet target containing tin-dioxide (SnO2) nanoparticles. By using a low SnO2 concentration (6%) solution and dual laser pulses for the plasma control, we observed the EUV conversion efficiency of 1.2% with undetectable debris.

  11. Low-debris, efficient laser-produced plasma extreme ultraviolet source by use of a regenerative liquid microjet target containing tin dioxide (SnO2) nanoparticles

    International Nuclear Information System (INIS)

    Higashiguchi, Takeshi; Dojyo, Naoto; Hamada, Masaya; Sasaki, Wataru; Kubodera, Shoichi

    2006-01-01

    We demonstrated a low-debris, efficient laser-produced plasma extreme ultraviolet (EUV) source by use of a regenerative liquid microjet target containing tin-dioxide (SnO 2 ) nanoparticles. By using a low SnO 2 concentration (6%) solution and dual laser pulses for the plasma control, we observed the EUV conversion efficiency of 1.2% with undetectable debris

  12. Microinstallations Based on Renewable Energy Sources in the Construction Sector

    Science.gov (United States)

    Kurzak, Lucjan

    2017-10-01

    The focus of this paper is on the status and prognoses of the use of microinstallations based on renewable energy sources to supply heat and power. The technologies that have been important in Europe and Poland for microgeneration of electricity include photovoltaic systems, micro wind turbines and co-generation systems. Solar collectors, heat pumps and biomass have also been used to generate heat. Microinstallations for renewable energy sources represent the initial point and the foundation for the development of micro networks, intelligent networks and the whole prosumer energy sector.

  13. POKEHEAD: An Open Source Interactive Headphone Based HCI Platform

    DEFF Research Database (Denmark)

    Højlund, Marie; Trento, Stefano; Goudarzi, Visda

    2012-01-01

    This paper introduces a novel interactive, human-computer interface and remote social communication system based on an augmented, hi-fidelity audio headphone platform. Specifically, this system- named Pokehead, currently utilizes the DUL embedded open-source accelerometer platform to gather 3-axis......, open source implementation. Our rapid prototype proved to be robust enough to work in performance for demonstration purposes and serves as a working proof of concept. In this paper we provide a technical description of our prototype, illustrate the context and motivation behind the project, and offer...

  14. Laser wakefield accelerator based light sources: potential applications and requirements

    Energy Technology Data Exchange (ETDEWEB)

    Albert, F. [Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). NIF and Photon Sciences; Thomas, A. G. [Univ. of Michigan, Ann Arbor, MI (United States). Dept. of Nuclear Engineering and Radiological Sciences; Mangles, S. P.D. [Imperial College, London (United Kingdom). Blackett Lab.; Banerjee, S. [Univ. of Nebraska, Lincoln, NE (United States); Corde, S. [SLAC National Accelerator Lab., Menlo Park, CA (United States); Flacco, A. [ENSTA, CNRS, Ecole Polytechnique, Palaiseau (France); Litos, M. [SLAC National Accelerator Lab., Menlo Park, CA (United States); Neely, D. [Science and Technology Facilities Council (STFC), Oxford (United Kingdom). Rutherford Appleton Lab. (RAL). Central Laser Facility; Viera, J. [Univ. of Lisbon (Portugal). GoLP-Inst. de Plasmas e Fusao Nuclear-Lab. Associado; Najmudin, Z. [Imperial College, London (United Kingdom). Blackett Lab.; Bingham, R. [Science and Technology Facilities Council (STFC), Oxford (United Kingdom). Rutherford Appleton Lab. (RAL). Central Laser Facility; Joshi, C. [Univ. of California, Los Angeles, CA (United States). Dept. of Electrical Engineering; Katsouleas, T. [Duke Univ., Durham, NC (United States). Platt School of Engineering

    2015-01-15

    In this article we review the prospects of laser wakefield accelerators as next generation light sources for applications. This work arose as a result of discussions held at the 2013 Laser Plasma Accelerators Workshop. X-ray phase contrast imaging, X-ray absorption spectroscopy, and nuclear resonance fluorescence are highlighted as potential applications for laser-plasma based light sources. We discuss ongoing and future efforts to improve the properties of radiation from plasma betatron emission and Compton scattering using laser wakefield accelerators for these specific applications.

  15. Accelerator based neutron source for neutron capture therapy

    International Nuclear Information System (INIS)

    Salimov, R.; Bayanov, B.; Belchenko, Yu.; Belov, V.; Davydenko, V.; Donin, A.; Dranichnikov, A.; Ivanov, A.; Kandaurov, I; Kraynov, G.; Krivenko, A.; Kudryavtsev, A.; Kursanov, N.; Savkin, V.; Shirokov, V.; Sorokin, I.; Taskaev, S.; Tiunov, M.

    2004-01-01

    Full text: The Budker Institute of Nuclear Physics (Novosibirsk) and the Institute of Physics and Power Engineering (Obninsk) have proposed an accelerator based neutron source for neutron capture and fast neutron therapy for hospital. Innovative approach is based upon vacuum insulation tandem accelerator (VITA) and near threshold 7 Li(p,n) 7 Be neutron generation. Pilot accelerator based neutron source for neutron capture therapy is under construction now at the Budker Institute of Nuclear Physics, Novosibirsk, Russia. In the present report, the pilot facility design is presented and discussed. Design features of facility components are discussed. Results of experiments and simulations are presented. Complete experimental tests are planned by the end of the year 2005

  16. FIRST MEASUREMENTS OF THE MASS OF CORONAL MASS EJECTIONS FROM THE EUV DIMMING OBSERVED WITH STEREO EUVI A+B SPACECRAFT

    International Nuclear Information System (INIS)

    Aschwanden, Markus J.; Nitta, Nariaki V.; Wuelser, Jean-Pierre; Lemen, James R.; Sandman, Anne; Vourlidas, Angelos; Colaninno, Robin C.

    2009-01-01

    The masses of coronal mass ejections (CMEs) have traditionally been determined from white-light coronagraphs (based on Thomson scattering of electrons), as well as from extreme ultraviolet (EUV) dimming observed with one spacecraft. Here we develop an improved method of measuring CME masses based on EUV dimming observed with the dual STEREO/EUVI spacecraft in multiple temperature filters that includes three-dimensional volume and density modeling in the dimming region and background corona. As a test, we investigate eight CME events with previous mass determinations from STEREO/COR2, of which six cases are reliably detected with the Extreme Ultraviolet Imager (EUVI) using our automated multi-wavelength detection code. We find CME masses in the range of m CME = (2-7) x 10 15 g. The agreement between the two EUVI/A and B spacecraft is m A /m B = 1.3 ± 0.6 and the consistency with white-light measurements by COR2 is m EUVI /m COR2 = 1.1 ± 0.3. The consistency between EUVI and COR2 implies no significant mass backflows (or inflows) at r sun and adequate temperature coverage for the bulk of the CME mass in the range of T ∼ 0.5-3.0 MK. The temporal evolution of the EUV dimming allows us to also model the evolution of the CME density n e (t), volume V(t), height-time h(t), and propagation speed v(t) in terms of an adiabatically expanding self-similar geometry. We determine e-folding EUV dimming times of t D = 1.3 ± 1.4 hr. We test the adiabatic expansion model in terms of the predicted detection delay (Δt ∼ 0.7 hr) between EUVI and COR2 for the fastest CME event (2008 March 25) and find good agreement with the observed delay (Δt ∼ 0.8 hr).

  17. Open Source Web Based Geospatial Processing with OMAR

    Directory of Open Access Journals (Sweden)

    Mark Lucas

    2009-01-01

    Full Text Available The availability of geospatial data sets is exploding. New satellites, aerial platforms, video feeds, global positioning system tagged digital photos, and traditional GIS information are dramatically increasing across the globe. These raw materials need to be dynamically processed, combined and correlated to generate value added information products to answer a wide range of questions. This article provides an overview of OMAR web based geospatial processing. OMAR is part of the Open Source Software Image Map project under the Open Source Geospatial Foundation. The primary contributors of OSSIM make their livings by providing professional services to US Government agencies and programs. OMAR provides one example that open source software solutions are increasingly being deployed in US government agencies. We will also summarize the capabilities of OMAR and its plans for near term development.

  18. Accelerator-based cold neutron sources and their cooling system

    International Nuclear Information System (INIS)

    Inoue, Kazuhiko; Yanai, Masayoshi; Ishikawa, Yoshikazu.

    1985-01-01

    We have developed and installed two accelerator-based cold neutron sources within a electron linac at Hokkaido University and a proton synchrotoron at National Laboratory for High Energy Physics. Solid methane at 20K was adopted as the cold moderator. The methane condensing heat exchangers attached directly to the moderator chambers were cooled by helium gas, which was kept cooled in refrigerators and circulated by ventilation fans. Two cold neutron sources have operated smoothly and safely for the past several years. In this paper we describe some of the results obtained in the preliminary experiments by using a modest capacity refrigerator, the design philosophy of the cooling system for the pulsed cold neutron sources, and outline of two facilities. (author)

  19. Visual color matching system based on RGB LED light source

    Science.gov (United States)

    Sun, Lei; Huang, Qingmei; Feng, Chen; Li, Wei; Wang, Chaofeng

    2018-01-01

    In order to study the property and performance of LED as RGB primary color light sources on color mixture in visual psychophysical experiments, and to find out the difference between LED light source and traditional light source, a visual color matching experiment system based on LED light sources as RGB primary colors has been built. By simulating traditional experiment of metameric color matching in CIE 1931 RGB color system, it can be used for visual color matching experiments to obtain a set of the spectral tristimulus values which we often call color-matching functions (CMFs). This system consists of three parts: a monochromatic light part using blazed grating, a light mixing part where the summation of 3 LED illuminations are to be visually matched with a monochromatic illumination, and a visual observation part. The three narrow band LEDs used have dominant wavelengths of 640 nm (red), 522 nm (green) and 458 nm (blue) respectively and their intensities can be controlled independently. After the calibration of wavelength and luminance of LED sources with a spectrophotometer, a series of visual color matching experiments have been carried out by 5 observers. The results are compared with those from CIE 1931 RGB color system, and have been used to compute an average locus for the spectral colors in the color triangle, with white at the center. It has been shown that the use of LED is feasible and has the advantages of easy control, good stability and low cost.

  20. Source-Based Tasks in Writing Independent and Integrated Essays

    Directory of Open Access Journals (Sweden)

    Javad Gholami

    2017-07-01

    Full Text Available Integrated writing tasks have gained considerable attention in ESL and EFL writing assessment and are frequently needed and used in academic settings and daily life. However, they are very rarely practiced and promoted in writing classes. This paper explored the effects of source-based writing practice on EFL learners’ composing abilities and investigated the probable differences between those tasks and independent writing ones in improving Iranian EFL learners’ essay writing abilities. To this end, a quasi-experimental design was implemented to gauge EFL learners’ writing improvements using a pretest-posttest layout. Twenty female learners taking a TOEFL iBT preparation course were randomly divided into an only-writing group with just independent writing instruction and essay practice, and a hybrid-writing-approach group receiving instruction and practice on independent writing plus source-based essay writing for ten sessions. Based on the findings, the participants with hybrid writing practice outperformed their counterparts in integrated essay tests. Their superior performance was not observed in the case of traditional independent writing tasks. The present study calls for incorporating more source-based writing tasks in writing courses.

  1. Superintensive pulse slow neutron source SIN based on kaon factory

    International Nuclear Information System (INIS)

    Kolmichkov, N.V.; Laptev, V.D.; Matveev, V.A.

    1991-01-01

    Possibility of intensive pulse slow neutron source creation based on 45-GeV proton synchrotron of K-meson factory, planned to construction in INR AS USSR is considered. Calculated peak thermal neutrons flux density value, averaged on 'radiating' light-water moderator surface of 100 cm 2 is 6.6 x 10 17 neutrons/(cm 2 sec) for pulse duration of 35 microseconds. (author)

  2. A proposed new method for the determination of the solar irradiance at EUV wavelength range

    Science.gov (United States)

    Feldman, Uri; Doschek, G. A.; Seely, J. F.; Landi, E.; Dammasch, I.

    The solar irradiance in the far ultraviolet (FUV) and extreme ultraviolet (EUV) and its time variability are important inputs to geospace models. It provides the primary mechanism for heating the earth's upper atmosphere and creating the ionosphere. Understanding various space weather phenomena requires reliable detailed knowledge of the solar EUV irradiance. Ideally one would like to have a single well-calibrated, high-resolution spectrometer that can continuously monitor the solar irradiance over the relevant wavelengths range. Since this is much too difficult to accomplish, a number of monitoring instruments were constructed in the past, each covering a fraction of the required wavelength range. Assembling solar irradiance from measurements by a number of instruments is extremely difficult and is usually plagued by large uncertainties. To overcome some of the difficulties resulting from such procedures, empirical models have been developed that rely in large part on solar activity levels as proxies. In recent years a different approach has been established for the determination of the solar irradiance, an approach independent of irradiance observations. The new approach is based on the line intensities calculated from emission measure (EM) distributions across the solar surface. The EM distributions are derived from spatially and spectrally resolved measurements of line intensities and describe the temperature and density structure of the basic large scale features of the solar atmosphere, specifically coronal holes, quiet Sun, and active regions. Recently, as a result of detailed analysis of solar upper atmosphere (SUA) spectra recorded by SUMER/SoHO it was discovered that, in contrast to earlier beliefs, the solar EM in 3x105 -4x106 K plasmas does not appear to vary continuously with temperature as previously assumed. Instead it appears to be composed of isothermal structures where each can attain but one of the following four main temperatures: 5x105 , 9x105

  3. System integration and performance of the EUV engineering test stand

    International Nuclear Information System (INIS)

    Tichenor, Daniel A.; Ray-Chaudhuri, Avijit K.; Replogle, William C.; Stulen, Richard H.; Kubiak, Glenn D.; Rockett, Paul D.; Klebanoff, Leonard E.; Jefferson, Karen L.; Leung, Alvin H.; Wronosky, John B.; Hale, Layton C.; Chapman, Henry N.; Taylor, John S.; Folta, James A.; Montcalm, Claude; Soufli, Regina; Spiller, Eberhard; Blaedel, Kenneth; Sommargren, Gary E.; Sweeney, Donald W.; Naulleau, Patrick; Goldberg, Kenneth A.; Gullikson, Eric M.; Bokor, Jeffrey; Batson, Phillip J.; Attwood, David T.; Jackson, Keith H.; Hector, Scott D.; Gwyn, Charles W.; Yan, Pei-Yang; Yan, P.

    2001-01-01

    The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k 1 of 0.52. The illuminator produces 13.4 nm radiation from a laser-produced plasma, directs the radiation onto an arc-shaped field of view, and provides an effective fill factor at the pupil plane of 0.7. The ETS is designed for full-field images in step-and-scan mode using vacuum-compatible, magnetically levitated, scanning stages. This paper describes system performance observed during the first phase of integration, including static resist images of 100 nm isolated and dense features

  4. Breakout Reconnection Observed by the TESIS EUV Telescope

    Science.gov (United States)

    Reva, A. A.; Ulyanov, A. S.; Shestov, S. V.; Kuzin, S. V.

    2016-01-01

    We present experimental evidence of the coronal mass ejection (CME) breakout reconnection, observed by the TESIS EUV telescope. The telescope could observe solar corona up to 2 R⊙ from the Sun center in the Fe 171 Å line. Starting from 2009 April 8, TESIS observed an active region (AR) that had a quadrupolar structure with an X-point 0.5 R⊙ above photosphere. A magnetic field reconstructed from the Michelson Doppler Imager data also has a multipolar structure with an X-point above the AR. At 21:45 UT on April 9, the loops near the X-point started to move away from each other with a velocity of ≈7 km s-1. At 01:15 UT on April 10, a bright stripe appeared between the loops, and the flux in the GOES 0.5-4 Å channel increased. We interpret the loops’ sideways motion and the bright stripe as evidence of the breakout reconnection. At 01:45 UT, the loops below the X-point started to slowly move up. At 15:10 UT, the CME started to accelerate impulsively, while at the same time a flare arcade formed below the CME. After 15:50 UT, the CME moved with constant velocity. The CME evolution precisely followed the breakout model scenario.

  5. BREAKOUT RECONNECTION OBSERVED BY THE TESIS EUV TELESCOPE

    Energy Technology Data Exchange (ETDEWEB)

    Reva, A. A.; Ulyanov, A. S.; Shestov, S. V.; Kuzin, S. V., E-mail: reva.antoine@gmail.com [Lebedev Physical Institute, Russian Academy of Sciences (Russian Federation)

    2016-01-10

    We present experimental evidence of the coronal mass ejection (CME) breakout reconnection, observed by the TESIS EUV telescope. The telescope could observe solar corona up to 2 R{sub ⊙} from the Sun center in the Fe 171 Å line. Starting from 2009 April 8, TESIS observed an active region (AR) that had a quadrupolar structure with an X-point 0.5 R{sub ⊙} above photosphere. A magnetic field reconstructed from the Michelson Doppler Imager data also has a multipolar structure with an X-point above the AR. At 21:45 UT on April 9, the loops near the X-point started to move away from each other with a velocity of ≈7 km s{sup −1}. At 01:15 UT on April 10, a bright stripe appeared between the loops, and the flux in the GOES 0.5–4 Å channel increased. We interpret the loops’ sideways motion and the bright stripe as evidence of the breakout reconnection. At 01:45 UT, the loops below the X-point started to slowly move up. At 15:10 UT, the CME started to accelerate impulsively, while at the same time a flare arcade formed below the CME. After 15:50 UT, the CME moved with constant velocity. The CME evolution precisely followed the breakout model scenario.

  6. Grazing incidence EUV study of the Alcator tokamaks

    International Nuclear Information System (INIS)

    Castracane, J.

    1982-01-01

    The use of impurity radiation to examine plasma conditions is a well known technique. To gain access, however, to the hot, central portion of the plasma created in the present confinement machines it is necessary to be able to observe radiation from medium and heavy elements such as molybdenum and iron. These impurities radiate primarily in the extreme ultra violet region of the spectrum and can play a role in the power balance of the tokamak. Radiation from highly ionized molybdenum was examined on the Alcator A and C tokamaks using a photometrically calibrated one meter grazing incidence monochromator. On Alcator A, a pseudo-continuum of Mo emissions in the 60 to 100 A ranges were seen to comprise 17% of the radiative losses from the plasma. This value closely matched measurements by a broad band bolometer array. Following these preliminary measurements, the monochromator was transferred to Alcator C for a more thorough examination of EUV emissions. Deviations from predicted scaling laws for energy confinement time vs density were observed on this machine

  7. BREAKOUT RECONNECTION OBSERVED BY THE TESIS EUV TELESCOPE

    International Nuclear Information System (INIS)

    Reva, A. A.; Ulyanov, A. S.; Shestov, S. V.; Kuzin, S. V.

    2016-01-01

    We present experimental evidence of the coronal mass ejection (CME) breakout reconnection, observed by the TESIS EUV telescope. The telescope could observe solar corona up to 2 R ⊙ from the Sun center in the Fe 171 Å line. Starting from 2009 April 8, TESIS observed an active region (AR) that had a quadrupolar structure with an X-point 0.5 R ⊙ above photosphere. A magnetic field reconstructed from the Michelson Doppler Imager data also has a multipolar structure with an X-point above the AR. At 21:45 UT on April 9, the loops near the X-point started to move away from each other with a velocity of ≈7 km s −1 . At 01:15 UT on April 10, a bright stripe appeared between the loops, and the flux in the GOES 0.5–4 Å channel increased. We interpret the loops’ sideways motion and the bright stripe as evidence of the breakout reconnection. At 01:45 UT, the loops below the X-point started to slowly move up. At 15:10 UT, the CME started to accelerate impulsively, while at the same time a flare arcade formed below the CME. After 15:50 UT, the CME moved with constant velocity. The CME evolution precisely followed the breakout model scenario

  8. RCI Simulation for EUV spectra from Sn ions

    International Nuclear Information System (INIS)

    Kagawa, T; Tanuma, H; Ohashi, H; Nishihara, K

    2007-01-01

    Using the relativistic-configuration-interaction atomic structure code, RCI simulations for EUV spectra from Sn 10+ , Sn 11+ and Sn 12+ ions are carried out, where it is assumed that each ion is embedded in a LTE plasma with the electron temperature of 30 eV. To make clear assignment of the measured spectra, the value of the excitation energy limit, which is introduced to limit the number of excited states in the simulation, is changed to see the excitation-energy-limit dependence of the spectral shape. The simulated spectra are obtained as a superposition of line intensities due to all possible transitions between two states whose excitation energy from the ground state is lower than the excitation energy limit assumed. The RCI simulated spectra are compared to the spectra measured with the chargeexchange- collision experiment in which a rare gas such as Xe or He as a target is bombarded by a charge-selected tin ion. Applicability of the LTE model to a decay model in the charge exchange collision experiment is also discussed

  9. EUV emission from Kr and Xe capillary discharge plasmas

    International Nuclear Information System (INIS)

    Juschkin, L.; Ellwi, S.; Kunze, H-J.; Chuvatin, A.; Zakharov, S.V.

    2002-01-01

    Kr and Xe plasmas are very intensive emitters in the spectral range of 100-150 A, which is relevant for a number of applications (for example microlithography). We present investigations of the extreme utraviolet (EUV) emission from a slow capillary discharge with Kr and Xe fillings. The emission of Kr ions (Kr VIII to Kr XI) within the range of 70-150 A consists of three bands of lines of about 10 A width with maxima at 116, 103 and 86 A. Xe emission bands of about 15 A width have their maxima at 136 and 115 A (Xe IX to Xe XII). The radiation duration in this spectral range is ∼150 ns for both elements. At the optimum conditions, the Kr emission at 103 A is 2-3 times more intense than the Xe emission at 136 A. The measured spectral energy of Kr radiation is about 0.1 J sr -1 A -1 . Experimental results are compared with numerical modellings of the dynamics and emission of the capillary discharge plasma, which enables the determination of plasma parameters and the future use of the codes as additional instruments for plasma diagnostics. (author)

  10. The EUV chromospheric network in the quiet Sun

    International Nuclear Information System (INIS)

    Reeves, E.M.

    1976-01-01

    Investigations on the structure and intensity of the chromospheric network from quiet solar regions have been carried out with EUV data obtained from the Harvard spectroheliometer on the Apollo Telescope Mount of Skylab. The distribution of intensities within supergranulation cell interiors follows a near normal function, where the standard deviation exceeds the value expected from the counting rate, which indicates fine-scale structure below the 5 arc sec resolution of the data. The intensities from the centers of supergranulation cells appear to be the same in both quiet regions and coronal holes, although the network is significantly different in the two types of regions. The average halfwidth of the network elements was measured as 10 arc sec, and was independent of the temperature of formation of the observing line for 3.8< logTsub(e)<5.8. The contrast between the network and the centers of cells is greatest for lines with logTsub(e)approximately5.2, where the network contributes approximately 75% of the intensity of quiet solar regions. The contrast and fractional intensity contributions decrease to higher and lower temperatures characteristic of the corona and chromosphere. (Auth.)

  11. Using synchrotron light to accelerate EUV resist and mask materials learning

    Science.gov (United States)

    Naulleau, Patrick; Anderson, Christopher N.; Baclea-an, Lorie-Mae; Denham, Paul; George, Simi; Goldberg, Kenneth A.; Jones, Gideon; McClinton, Brittany; Miyakawa, Ryan; Mochi, Iacopo; Montgomery, Warren; Rekawa, Seno; Wallow, Tom

    2011-03-01

    As commercialization of extreme ultraviolet lithography (EUVL) progresses, direct industry activities are being focused on near term concerns. The question of long term extendibility of EUVL, however, remains crucial given the magnitude of the investments yet required to make EUVL a reality. Extendibility questions are best addressed using advanced research tools such as the SEMATECH Berkeley microfield exposure tool (MET) and actinic inspection tool (AIT). Utilizing Lawrence Berkeley National Laboratory's Advanced Light Source facility as the light source, these tools benefit from the unique properties of synchrotron light enabling research at nodes generations ahead of what is possible with commercial tools. The MET for example uses extremely bright undulator radiation to enable a lossless fully programmable coherence illuminator. Using such a system, resolution enhancing illuminations achieving k1 factors of 0.25 can readily be attained. Given the MET numerical aperture of 0.3, this translates to an ultimate resolution capability of 12 nm. Using such methods, the SEMATECH Berkeley MET has demonstrated resolution in resist to 16-nm half pitch and below in an imageable spin-on hard mask. At a half pitch of 16 nm, this material achieves a line-edge roughness of 2 nm with a correlation length of 6 nm. These new results demonstrate that the observed stall in ultimate resolution progress in chemically amplified resists is a materials issue rather than a tool limitation. With a resolution limit of 20-22 nm, the CAR champion from 2008 remains as the highest performing CAR tested to date. To enable continued advanced learning in EUV resists, SEMATECH has initiated a plan to implement a 0.5 NA microfield tool at the Advanced Light Source synchrotron facility. This tool will be capable of printing down to 8-nm half pitch.

  12. Perspectives on source terms based on early research and development

    International Nuclear Information System (INIS)

    Pressesky, A.J.

    1985-07-01

    This report presents an overview of the key documentation of the research and development programs relevant to the source term issue which were undertaken by the Atomic Energy Commission between 1950 and 1970. The source term is taken to be the amount, composition (physical and chemical), and timing of the projected release of radioactivity to the environment in the hypothetical event of a severe reactor accident in a light water reactor of the type currently being licensed, built and operated. The objective is to illuminate and provide perspectives on (a) the maturity of the technical data base and the analytical methodology, (b) the extent to which remaining conservatisms can be applied to compensate for uncertainties, (c) the purpose for which the technology and methodology will be used, and (d) the need to keep problems and uncertainties in proper perspective. Comments that can provide some context for the difficult programmatic choices to be made are included, and technical considerations that may be inadequately applied or neglected in some current source term calculations were studied. This review has not uncovered any significant technical considerations that have been omitted or are being inadequately treated in current source term analyses, except perhaps the contribution made to in-containment aerosols by coolant comminution upon escape at pressure from the reactor coolant system. 11 refs

  13. GEM-based thermal neutron beam monitors for spallation sources

    International Nuclear Information System (INIS)

    Croci, G.; Claps, G.; Caniello, R.; Cazzaniga, C.; Grosso, G.; Murtas, F.; Tardocchi, M.; Vassallo, E.; Gorini, G.; Horstmann, C.; Kampmann, R.; Nowak, G.; Stoermer, M.

    2013-01-01

    The development of new large area and high flux thermal neutron detectors for future neutron spallation sources, like the European Spallation Source (ESS) is motivated by the problem of 3 He shortage. In the framework of the development of ESS, GEM (Gas Electron Multiplier) is one of the detector technologies that are being explored as thermal neutron sensors. A first prototype of GEM-based thermal neutron beam monitor (bGEM) has been built during 2012. The bGEM is a triple GEM gaseous detector equipped with an aluminum cathode coated by 1μm thick B 4 C layer used to convert thermal neutrons to charged particles through the 10 B(n, 7 Li)α nuclear reaction. This paper describes the results obtained by testing a bGEM detector at the ISIS spallation source on the VESUVIO beamline. Beam profiles (FWHM x =31 mm and FWHM y =36 mm), bGEM thermal neutron counting efficiency (≈1%), detector stability (3.45%) and the time-of-flight spectrum of the beam were successfully measured. This prototype represents the first step towards the development of thermal neutrons detectors with efficiency larger than 50% as alternatives to 3 He-based gaseous detectors

  14. Development open source microcontroller based temperature data logger

    Science.gov (United States)

    Abdullah, M. H.; Che Ghani, S. A.; Zaulkafilai, Z.; Tajuddin, S. N.

    2017-10-01

    This article discusses the development stages in designing, prototyping, testing and deploying a portable open source microcontroller based temperature data logger for use in rough industrial environment. The 5V powered prototype of data logger is equipped with open source Arduino microcontroller for integrating multiple thermocouple sensors with their module, secure digital (SD) card storage, liquid crystal display (LCD), real time clock and electronic enclosure made of acrylic. The program for the function of the datalogger is programmed so that 8 readings from the thermocouples can be acquired within 3 s interval and displayed on the LCD simultaneously. The recorded temperature readings at four different points on both hydrodistillation show similar profile pattern and highest yield of extracted oil was achieved on hydrodistillation 2 at 0.004%. From the obtained results, this study achieved the objective of developing an inexpensive, portable and robust eight channels temperature measuring module with capabilities to monitor and store real time data.

  15. Progress in extremely high brightness LED-based light sources

    Science.gov (United States)

    Hoelen, Christoph; Antonis, Piet; de Boer, Dick; Koole, Rolf; Kadijk, Simon; Li, Yun; Vanbroekhoven, Vincent; Van De Voorde, Patrick

    2017-09-01

    Although the maximum brightness of LEDs has been increasing continuously during the past decade, their luminance is still far from what is required for multiple applications that still rely on the high brightness of discharge lamps. In particular for high brightness applications with limited étendue, e.g. front projection, only very modest luminance values in the beam can be achieved with LEDs compared to systems based on discharge lamps or lasers. With dedicated architectures, phosphor-converted green LEDs for projection may achieve luminance values up to 200-300 Mnit. In this paper we report on the progress made in the development of light engines based on an elongated luminescent concentrator pumped by blue LEDs. This concept has recently been introduced to the market as ColorSpark High Lumen Density LED technology. These sources outperform the maximum brightness of LEDs by multiple factors. In LED front projection, green LEDs are the main limiting factor. With our green modules, we now have achieved peak luminance values of 2 Gnit, enabling LED-based projection systems with over 4000 ANSI lm. Extension of this concept to yellow and red light sources is presented. The light source efficiency has been increased considerably, reaching 45-60 lm/W for green under practical application conditions. The module architecture, beam shaping, and performance characteristics are reviewed, as well as system aspects. The performance increase, spectral range extensions, beam-shaping flexibility, and cost reductions realized with the new module architecture enable a breakthrough in LED-based projection systems and in a wide variety of other high brightness applications.

  16. Extreme ultraviolet (EUV) solar spectral irradiance (SSI) for ionospheric application - history and contemporary state-of-art

    Science.gov (United States)

    Schmidtke, G.; Jacobi, Ch.; Nikutowski, B.; Erhardt, Ch.

    2014-11-01

    After a historical survey of space related EUV measurements in Germany and the role of Karl Rawer in pursuing this work, we describe present developments in EUV spectroscopy and provide a brief outlook on future activities. The group of Karl Rawer has performed the first scientific space project in Western Europe on 19th October 1954. Then it was decided to include the field of solar EUV spectroscopy in ionospheric investigations. Starting in 1957 an intensified development of instrumentation was going on to explore solar EUV radiation, atmospheric airglow and auroral emissions until the institute had to stop space activities in the early nineteen-eighties. EUV spectroscopy was continued outside of the institute during eight years. This area of work was supported again by the institute developing the Auto-Calibrating Spectrometers (SolACES) for a mission on the International Space Station (ISS). After more than six years in space the instrument is still in operation. Meanwhile the work on the primary task also to validate EUV data available from other space missions has made good progress. The first results of validating those data and combine them into one set of EUV solar spectral irradiance are very promising. It will be recommended for using it by the science and application community. Moreover, a new low-cost type of an EUV spectrometer is presented for monitoring the solar EUV radiation. It shall be further developed for providing EUV-TEC data to be applied in ionospheric models replacing the Covington index F10.7. Applying these data for example in the GNSS signal evaluation a more accurate determination of GNSS receiver positions is expected for correcting the propagation delays of navigation signals traveling through the ionosphere from space to earth. - Latest results in the field of solar EUV spectroscopy are discussed, too.

  17. The inner-relationship of hard X-ray and EUV bursts during solar flares

    International Nuclear Information System (INIS)

    Emslie, A.G.; Brown, J.C.; Donnelly, R.F.

    1978-01-01

    A comparison is made between the flux-versus-time profile in the EUV band and the thick target electron flux profile as inferred from hard X-rays for a number of moderately large solar flares. This complements Kane and Donnelly's (1971) study of small flares. The hard X-ray data are from ESRO TD-1A and the EUV inferred from SFD observations. Use of a chi 2 minimising method shows that the best overall fit between the profile fine structures obtains for synchronism to < approximately 5 s which is within the timing accuracy. This suggests that neither conduction nor convection is fast enough as the primary mechanism of energy transport into the EUV flare and rather favours heating by the electrons themselves or by some MHD wave process much faster than acoustic waves. The electron power deposited, for a thick target model, is however far greater than the EUV luminosity for any reasonable assumptions about the area and depth over which EUV is emitted. This means that either most of the power deposited is conducted away to the optical flare or that only a fraction < approximately 1-10% of the X-ray emitting electrons are injected downwards. Recent work on Hα flare heating strongly favours the latter alternative - i.e. that electrons are mostly confined in the corona. (Auth.)

  18. Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy.

    Science.gov (United States)

    Schriever, G; Mager, S; Naweed, A; Engel, A; Bergmann, K; Lebert, R

    1998-03-01

    Extended ultraviolet (EUV) emission characteristics of a laser-produced lithium plasma are determined with regard to the requirements of x-ray photoelectron spectroscopy. The main features of interest are spectral distribution, photon flux, bandwidth, source size, and emission duration. Laser-produced lithium plasmas are characterized as emitters of intense narrow-band EUV radiation. It can be estimated that the lithium Lyman-alpha line emission in combination with an ellipsoidal silicon/molybdenum multilayer mirror is a suitable EUV source for an x-ray photoelectron spectroscopy microscope with a 50-meV energy resolution and a 10-mum lateral resolution.

  19. Developing seismogenic source models based on geologic fault data

    Science.gov (United States)

    Haller, Kathleen M.; Basili, Roberto

    2011-01-01

    Calculating seismic hazard usually requires input that includes seismicity associated with known faults, historical earthquake catalogs, geodesy, and models of ground shaking. This paper will address the input generally derived from geologic studies that augment the short historical catalog to predict ground shaking at time scales of tens, hundreds, or thousands of years (e.g., SSHAC 1997). A seismogenic source model, terminology we adopt here for a fault source model, includes explicit three-dimensional faults deemed capable of generating ground motions of engineering significance within a specified time frame of interest. In tectonically active regions of the world, such as near plate boundaries, multiple seismic cycles span a few hundred to a few thousand years. In contrast, in less active regions hundreds of kilometers from the nearest plate boundary, seismic cycles generally are thousands to tens of thousands of years long. Therefore, one should include sources having both longer recurrence intervals and possibly older times of most recent rupture in less active regions of the world rather than restricting the model to include only Holocene faults (i.e., those with evidence of large-magnitude earthquakes in the past 11,500 years) as is the practice in tectonically active regions with high deformation rates. During the past 15 years, our institutions independently developed databases to characterize seismogenic sources based on geologic data at a national scale. Our goal here is to compare the content of these two publicly available seismogenic source models compiled for the primary purpose of supporting seismic hazard calculations by the Istituto Nazionale di Geofisica e Vulcanologia (INGV) and the U.S. Geological Survey (USGS); hereinafter we refer to the two seismogenic source models as INGV and USGS, respectively. This comparison is timely because new initiatives are emerging to characterize seismogenic sources at the continental scale (e.g., SHARE in the

  20. Lithium current sources with an electrolyte based on aprotonic solvents

    Energy Technology Data Exchange (ETDEWEB)

    Shembel, Ye.M.; Ksenzhek, O.S.; Litvinova, V.I.; Martynenko, T.L.; Raykhelson, L.B.; Sokolov, L.A.; Strizhko, A.S.

    1984-01-01

    Lithium current sources with an electrolyte based on aprotonic solvents are examined. The effect of the composition of the electrolyte solution on the solubility of SO2 and the excess pressure of the gas above the electrolyte solution is established. The temperature characteristics of the electrolyte are studied from the standpoint of salt solubility, the association between the discharge conditions, the macrostructure of the porous inert cathode and the degree of usage of the active cathode substance of the SO2 as the necessary aspects for solving the problems of optimizing a lithium and SO2 system.

  1. Bioimaging of cells and tissues using accelerator-based sources.

    Science.gov (United States)

    Petibois, Cyril; Cestelli Guidi, Mariangela

    2008-07-01

    A variety of techniques exist that provide chemical information in the form of a spatially resolved image: electron microprobe analysis, nuclear microprobe analysis, synchrotron radiation microprobe analysis, secondary ion mass spectrometry, and confocal fluorescence microscopy. Linear (LINAC) and circular (synchrotrons) particle accelerators have been constructed worldwide to provide to the scientific community unprecedented analytical performances. Now, these facilities match at least one of the three analytical features required for the biological field: (1) a sufficient spatial resolution for single cell (pros and cons of the most popular techniques that have been implemented on accelerator-based sources to address analytical issues on biological specimens.

  2. [Fatal occupational accidents: estimates based on more data sources].

    Science.gov (United States)

    Baldasseroni, A; Chellini, E; Zoppi, O; Giovannetti, L

    2001-01-01

    The data reported by INAIL (Istituto Nazionale Assicurazione Infortuni sul Lavoro) on fatal occupational injuries have always been considered complete and reliable. The authors of this article verified the completeness of this information source crossing it with data bases existing in different registration systems (Regional Mortality Registry of Tuscany--RMR; registers and data of the Operative Units of Prevention, Hygiene and Safety in the Workplace--UOPISLL) for the period between 1992 and 1996. In the five years concerned, a total of 458 cases were reported. These cases could be considered fatal injuries at work without taking into account traffic accidents, which were not included in the present study. The results show that the most complete information source was RMR, reporting 80% of the total data, while INAIL reports only 62.2% of the total cases. On the contrary, the UOPISLL source is the least reliable. Using the capture/recapture method, the estimate of events in the period concerned (1992-1996) amounts to nearly 500 (499.8 LC 475.9-523.7), while the three sources systematically explored for the whole period (INAIL, RMR, UOSPILL) report 458 cases. An additional information source, the daily press, which could be systematically tested only two months for each of the five years, reports 10 additional cases, which were ignored by the 3 other sources, indirectly confirming in this way how reliable the performed estimate was. The main cases among the 157 fatal accidents reported by RMR, but not by INAIL, occurred among farmers (70), most of them already retired, but there were several fatal accidents reported in the construction sector (30). Other categories were included only in the RMR data because, in the period concerned, they were not covered by INAIL insurance (18 cases in the Army and Police, 7 on the railways). The survey that was carried out confirms the essential importance of INAIL data for the surveillance system applied to this phenomenon. This

  3. Sources

    International Nuclear Information System (INIS)

    Duffy, L.P.

    1991-01-01

    This paper discusses the sources of radiation in the narrow perspective of radioactivity and the even narrow perspective of those sources that concern environmental management and restoration activities at DOE facilities, as well as a few related sources. Sources of irritation, Sources of inflammatory jingoism, and Sources of information. First, the sources of irritation fall into three categories: No reliable scientific ombudsman to speak without bias and prejudice for the public good, Technical jargon with unclear definitions exists within the radioactive nomenclature, and Scientific community keeps a low-profile with regard to public information. The next area of personal concern are the sources of inflammation. This include such things as: Plutonium being described as the most dangerous substance known to man, The amount of plutonium required to make a bomb, Talk of transuranic waste containing plutonium and its health affects, TMI-2 and Chernobyl being described as Siamese twins, Inadequate information on low-level disposal sites and current regulatory requirements under 10 CFR 61, Enhanced engineered waste disposal not being presented to the public accurately. Numerous sources of disinformation regarding low level radiation high-level radiation, Elusive nature of the scientific community, The Federal and State Health Agencies resources to address comparative risk, and Regulatory agencies speaking out without the support of the scientific community

  4. Analyses of the Sn IX-Sn XII spectra in the EUV region

    International Nuclear Information System (INIS)

    Churilov, S S; Ryabtsev, A N

    2006-01-01

    The Sn IX-Sn XII spectra excited in a vacuum spark have been analysed in the 130-160 A wavelength region. The analysis was based on the energy parameter extrapolation in the isonuclear Sn VI-VIII and Sn XIII-XIV sequence. 266 spectral lines belonging to the 4d m -(4d m-1 4f+4p 5 4d m+1 ) (m=6-3) transition arrays were classified in the Sn IX-Sn XII spectra for the first time. All 18 level energies of the 4d 3 configuration and 39 level energies of the strongly interacting 4d 2 4f and 4p 5 4d 4 configurations were established in the Sn XII spectrum. The energy differences between the majority of the 4d m levels and about 40 levels of the 4d m-1 4f+4p 5 4d m+1 configurations were determined in each of the Sn IX, Sn X and Sn XI spectra (m=6-4). As a result, all intense lines were classified in the 130-140 A region relevant to the extreme ultraviolet (EUV) lithography. It was shown that the most of the intense lines in the 2% bandwidth at 135 A belong to the transitions in the Sn XI-Sn XIII spectra

  5. Delineation of seismic source zones based on seismicity parameters ...

    Indian Academy of Sciences (India)

    these source zones were evaluated and were used in the hazard evaluation. ... seismic sources, linear and areal, were considered in the present study to model the seismic sources in the ..... taken as an authentic reference manual for iden-.

  6. FIRST SIMULTANEOUS OBSERVATION OF AN H{alpha} MORETON WAVE, EUV WAVE, AND FILAMENT/PROMINENCE OSCILLATIONS

    Energy Technology Data Exchange (ETDEWEB)

    Asai, Ayumi; Isobe, Hiroaki [Unit of Synergetic Studies for Space, Kyoto University, Yamashina, Kyoto 607-8471 (Japan); Ishii, Takako T.; Kitai, Reizaburo; Ichimoto, Kiyoshi; UeNo, Satoru; Nagata, Shin' ichi; Morita, Satoshi; Nishida, Keisuke; Shibata, Kazunari [Kwasan and Hida Observatories, Kyoto University, Yamashina, Kyoto 607-8471 (Japan); Shiota, Daikou [Advanced Science Institute, RIKEN, Wako, Saitama 351-0198 (Japan); Oi, Akihito [College of Science, Ibaraki University, Mito, Ibaraki 310-8512 (Japan); Akioka, Maki, E-mail: asai@kwasan.kyoto-u.ac.jp [Hiraiso Solar Observatory, National Institute of Information and Communications Technology, Hitachinaka, Ibaraki 311-1202 (Japan)

    2012-02-15

    We report on the first simultaneous observation of an H{alpha} Moreton wave, the corresponding EUV fast coronal waves, and a slow and bright EUV wave (typical EIT wave). We observed a Moreton wave, associated with an X6.9 flare that occurred on 2011 August 9 at the active region NOAA 11263, in the H{alpha} images taken by the Solar Magnetic Activity Research Telescope at Hida Observatory of Kyoto University. In the EUV images obtained by the Atmospheric Imaging Assembly on board the Solar Dynamic Observatory we found not only the corresponding EUV fast 'bright' coronal wave, but also the EUV fast 'faint' wave that is not associated with the H{alpha} Moreton wave. We also found a slow EUV wave, which corresponds to a typical EIT wave. Furthermore, we observed, for the first time, the oscillations of a prominence and a filament, simultaneously, both in the H{alpha} and EUV images. To trigger the oscillations by the flare-associated coronal disturbance, we expect a coronal wave as fast as the fast-mode MHD wave with the velocity of about 570-800 km s{sup -1}. These velocities are consistent with those of the observed Moreton wave and the EUV fast coronal wave.

  7. Time Variabilities of Solar Wind Ion Fluxes and of X-ray and EUV Emissions from Comet Hyakutake

    Science.gov (United States)

    Neugebauer, M.; Cravens, T.; Lisse, C.; Ipavich, F.; von Steiger, R.; Shah, P.; Armstrong, T.

    1999-01-01

    Observations of X-ray and extreme ultraviolet (EUV) emissions from comet C/Hyakutake 1996 B2 made by the Rontgen X-ray satellite (ROSAT) and the Extreme Ultraviolet Explorer (EUVE) revealed a total X-ray luminosity of about 500 MW.

  8. EUV blank defect and particle inspection with high throughput immersion AFM with 1nm 3D resolution

    NARCIS (Netherlands)

    Es, M.H. van; Sadeghian Marnani, H.

    2016-01-01

    Inspection of EUV mask substrates and blanks is demanding. We envision this is a good target application for massively parallel Atomic Force Microscopy (AFM). We envision to do a full surface characterization of EUV masks with AFM enabling 1nm true 3D resolution over the entire surface. The limiting

  9. Do factors related to combustion-based sources explain ...

    Science.gov (United States)

    Introduction: Spatial heterogeneity of effect estimates in associations between PM2.5 and total non-accidental mortality (TNA) in the United States (US), is an issue in epidemiology. This study uses rate ratios generated from the Multi-City/Multi-Pollutant study (1999-2005) for 313 core-based statistical areas (CBSA) and their metropolitan divisions (MD) to examine combustion-based sources of heterogeneity.Methods: For CBSA/MDs, area-specific log rate ratios (betas) were derived from a model adjusting for time, an interaction with age-group, day of week, and natural splines of current temperature, current dew point, and unconstrained temperature at lags 1, 2, and 3. We assessed the heterogeneity in the betas by linear regression with inverse variance weights, using average NO2, SO2, and CO, which may act as a combustion source proxy, and these pollutants’ correlations with PM2.5. Results: We found that weighted mean PM2.5 association (0.96 percent increase in total non-accidental mortality for a 10 µg/m3 increment in PM2.5) increased by 0.26 (95% confidence interval 0.08 , 0.44) for an interquartile change (0.2) in the correlation of SO2 and PM2.5., but betas showed less dependence on the annual averages of SO2 or NO2. Spline analyses suggest departures from linearity, particularly in a model that examined correlations between PM2.5 and CO.Conclusions: We conclude that correlations between SO2 and PM2.5 as an indicator of combustion sources explains some hete

  10. Open Source Architecture for Web-Based Oceanographic Data Services

    Directory of Open Access Journals (Sweden)

    R Venkat Shesu

    2013-08-01

    Full Text Available A GIS for ocean data applications named "Ocean Data and Information Systems (ODIS" was designed and developed. The system is based on the University of Minnesota MapServer, an open source platform for publishing spatial data and interactive mapping applications to the web with MySQL as the backend database server. This paper discusses some of the details of the storage and organization of oceanographic data, methods employed for visualization of parameter plots, and mapping of the data. ODIS is conceived to be an end-to-end system comprising acquisition of data from a variety of heterogeneous ocean platforms, processing, integration, quality control, and web-based dissemination to users for operational and research activities. ODIS provides efficient data management and potential mapping and visualization functions for oceanographic data.

  11. Cardiac magnetic source imaging based on current multipole model

    International Nuclear Information System (INIS)

    Tang Fa-Kuan; Wang Qian; Hua Ning; Lu Hong; Tang Xue-Zheng; Ma Ping

    2011-01-01

    It is widely accepted that the heart current source can be reduced into a current multipole. By adopting three linear inverse methods, the cardiac magnetic imaging is achieved in this article based on the current multipole model expanded to the first order terms. This magnetic imaging is realized in a reconstruction plane in the centre of human heart, where the current dipole array is employed to represent realistic cardiac current distribution. The current multipole as testing source generates magnetic fields in the measuring plane, serving as inputs of cardiac magnetic inverse problem. In the heart-torso model constructed by boundary element method, the current multipole magnetic field distribution is compared with that in the homogeneous infinite space, and also with the single current dipole magnetic field distribution. Then the minimum-norm least-squares (MNLS) method, the optimal weighted pseudoinverse method (OWPIM), and the optimal constrained linear inverse method (OCLIM) are selected as the algorithms for inverse computation based on current multipole model innovatively, and the imaging effects of these three inverse methods are compared. Besides, two reconstructing parameters, residual and mean residual, are also discussed, and their trends under MNLS, OWPIM and OCLIM each as a function of SNR are obtained and compared. (general)

  12. Future Synchrotron Light Sources Based on Ultimate Storage Rings

    International Nuclear Information System (INIS)

    Cai, Yunhai

    2012-01-01

    The main purpose of this talk is to describe how far one might push the state of the art in storage ring design. The talk will start with an overview of the latest developments and advances in the design of synchrotron light sources based on the concept of an 'ultimate' storage ring. The review will establish how bright a ring based light source might be, where the frontier of technological challenges are, and what the limits of accelerator physics are. Emphasis will be given to possible improvements in accelerator design and developments in technology toward the goal of achieving an ultimate storage ring. An ultimate storage ring (USR), defined as an electron ring-based light source having an emittance in both transverse planes at the diffraction limit for the range of X-ray wavelengths of interest for a scientific community, would provide very high brightness photons having high transverse coherence that would extend the capabilities of X-ray imaging and probe techniques beyond today's performance. It would be a cost-effective, high-coherence 4th generation light source, competitive with one based on energy recovery linac (ERL) technology, serving a large number of users studying material, chemical, and biological sciences. Furthermore, because of the experience accumulated over many decades of ring operation, it would have the great advantage of stability and reliability. In this paper we consider the design of an USR having 10-pm-rad emittance. It is a tremendous challenge to design a storage ring having such an extremely low emittance, a factor of 100 smaller than those in existing light sources, especially such that it has adequate dynamic aperture and beam lifetime. In many ultra-low emittance designs, the injection acceptances are not large enough for accumulation of the electron beam, necessitating on-axis injection where stored electron bunches are completely replaced with newly injected ones. Recently, starting with the MAX-IV 7-bend achromatic cell, we

  13. Future Synchrotron Light Sources Based on Ultimate Storage Rings

    Energy Technology Data Exchange (ETDEWEB)

    Cai, Yunhai; /SLAC

    2012-04-09

    The main purpose of this talk is to describe how far one might push the state of the art in storage ring design. The talk will start with an overview of the latest developments and advances in the design of synchrotron light sources based on the concept of an 'ultimate' storage ring. The review will establish how bright a ring based light source might be, where the frontier of technological challenges are, and what the limits of accelerator physics are. Emphasis will be given to possible improvements in accelerator design and developments in technology toward the goal of achieving an ultimate storage ring. An ultimate storage ring (USR), defined as an electron ring-based light source having an emittance in both transverse planes at the diffraction limit for the range of X-ray wavelengths of interest for a scientific community, would provide very high brightness photons having high transverse coherence that would extend the capabilities of X-ray imaging and probe techniques beyond today's performance. It would be a cost-effective, high-coherence 4th generation light source, competitive with one based on energy recovery linac (ERL) technology, serving a large number of users studying material, chemical, and biological sciences. Furthermore, because of the experience accumulated over many decades of ring operation, it would have the great advantage of stability and reliability. In this paper we consider the design of an USR having 10-pm-rad emittance. It is a tremendous challenge to design a storage ring having such an extremely low emittance, a factor of 100 smaller than those in existing light sources, especially such that it has adequate dynamic aperture and beam lifetime. In many ultra-low emittance designs, the injection acceptances are not large enough for accumulation of the electron beam, necessitating on-axis injection where stored electron bunches are completely replaced with newly injected ones. Recently, starting with the MAX-IV 7-bend

  14. Separation of non-stationary multi-source sound field based on the interpolated time-domain equivalent source method

    Science.gov (United States)

    Bi, Chuan-Xing; Geng, Lin; Zhang, Xiao-Zheng

    2016-05-01

    In the sound field with multiple non-stationary sources, the measured pressure is the sum of the pressures generated by all sources, and thus cannot be used directly for studying the vibration and sound radiation characteristics of every source alone. This paper proposes a separation model based on the interpolated time-domain equivalent source method (ITDESM) to separate the pressure field belonging to every source from the non-stationary multi-source sound field. In the proposed method, ITDESM is first extended to establish the relationship between the mixed time-dependent pressure and all the equivalent sources distributed on every source with known location and geometry information, and all the equivalent source strengths at each time step are solved by an iterative solving process; then, the corresponding equivalent source strengths of one interested source are used to calculate the pressure field generated by that source alone. Numerical simulation of two baffled circular pistons demonstrates that the proposed method can be effective in separating the non-stationary pressure generated by every source alone in both time and space domains. An experiment with two speakers in a semi-anechoic chamber further evidences the effectiveness of the proposed method.

  15. ERP correlates of source memory: Unitized source information increases familiarity-based retrieval

    OpenAIRE

    Diana, Rachel A.; Van den Boom, Wijnand; Yonelinas, Andrew P.; Ranganath, Charan

    2010-01-01

    Source memory tests typically require subjects to make decisions about the context in which an item was encoded and are thought to depend on recollection of details from the study episode. Although it is generally believed that familiarity does not contribute to source memory, recent behavioral studies have suggested that familiarity may also support source recognition when item and source information are integrated, or “unitized”, during study (Diana, Yonelinas, and Ranganath 2008). However,...

  16. A serendipitous observation of the gamma-ray burst GRB 921013b field with EUVE

    DEFF Research Database (Denmark)

    Castro-Tirado, A.J.; Gorosabel, J.; Bowyer, S.

    1999-01-01

    hours after the burst is 1.8 x10(-16) erg s(-1) cm(-2) after correction for absorption by the Galactic interstellar medium. Even if we exclude an intrinsic absorption, this is well below the detection limit of the EUVE measurement. Although it is widely accepted that gamma-ray bursts are at cosmological......We report a serendipitous extreme ultraviolet observation by EUVE of the field containing GRB 921013b, similar to 11 hours after its occurrence. This burst was detected on 1992 October 13 by the WATCH and PHEBUS on Granat, and by the GRB experiment on Ulysses. The lack of any transient (or...

  17. Small accelerator-based pulsed cold neutron sources

    International Nuclear Information System (INIS)

    Lanza, Richard C.

    1997-09-01

    Small neutron sources could be used by individual researchers with the convenience of an adequate local facility. Although these sources would produce lower fluxes than the national facilities, for selected applications, the convenience and availability may overcome the limitations on source strength. Such sources might also be useful for preliminary testing of ideas before going to a larger facility. Recent developments in small, high-current pulsed accelerators makes possible such a local source for pulsed cold neutrons.

  18. Liquid Li based neutron source for BNCT and science application

    International Nuclear Information System (INIS)

    Horiike, H.; Murata, I.; Iida, T.; Yoshihashi, S.; Hoashi, E.; Kato, I.; Hashimoto, N.; Kuri, S.; Oshiro, S.

    2015-01-01

    Liquid lithium (Li) is a candidate material for a target of intense neutron source, heat transfer medium in space engines and charges stripper. For a medical application of BNCT, epithermal neutrons with least energetic neutrons and γ-ray are required so as to avoid unnecessary doses to a patient. This is enabled by lithium target irradiated by protons at 2.5 MeV range, with utilizing the threshold reaction of "7Li(p,n)"7Be at 1.88 MeV. In the system, protons at 2.5 MeV penetrate into Li layer by 0.25 mm with dissipating heat load near the surface. To handle it, thin film flow of high velocity is important for stable operation. For the proton accelerator, electrostatic type of the Schnkel or the tandem is planned to be employed. Neutrons generated at 0.6 MeV are gently moderated to epithermal energy while suppressing accompanying γ-ray minimum by the dedicated moderator assembly. - Highlights: • Liquid lithium (Li) is a candidate material for a target of intense neutron source. • An accelerator based neutron source with p-liquid Li target for boron neutron capture therapy is under development in Osaka University, Japan. • In our system, the harmful radiation dose due to rays and fast neutrons will be suppressed very low. • The system performance are very promising as a state of art cancer treatment system. • The project is planned as a joint undertaking between industries and Osaka University.

  19. Ultrabroadband terahertz source and beamline based on coherent transition radiation

    Directory of Open Access Journals (Sweden)

    S. Casalbuoni

    2009-03-01

    Full Text Available Coherent transition radiation (CTR in the THz regime is an important diagnostic tool for analyzing the temporal structure of the ultrashort electron bunches needed in ultraviolet and x-ray free-electron lasers. It is also a powerful source of such radiation, covering an exceptionally broad frequency range from about 200 GHz to 100 THz. At the soft x-ray free-electron laser FLASH we have installed a beam transport channel for transition radiation (TR with the intention to guide a large fraction of the radiation to a laboratory outside the accelerator tunnel. The radiation is produced on a screen inside the ultrahigh vacuum beam pipe of the linac, coupled out through a diamond window and transported to the laboratory through an evacuated tube equipped with five focusing and four plane mirrors. The design of the beamline has been based on a thorough analysis of the generation of TR on metallic screens of limited size. The optical propagation of the radiation has been computed taking into account the effects of near-field (Fresnel diffraction. The theoretical description of the TR source is presented in the first part of the paper, while the design principles and the technical layout of the beamline are described in the second part. First experimental results demonstrate that the CTR beamline covers the specified frequency range and preserves the narrow time structure of CTR pulses emitted by short electron bunches.

  20. PV source based high voltage gain current fed converter

    Science.gov (United States)

    Saha, Soumya; Poddar, Sahityika; Chimonyo, Kudzai B.; Arunkumar, G.; Elangovan, D.

    2017-11-01

    This work involves designing and simulation of a PV source based high voltage gain, current fed converter. It deals with an isolated DC-DC converter which utilizes boost converter topology. The proposed converter is capable of high voltage gain and above all have very high efficiency levels as proved by the simulation results. The project intends to produce an output of 800 V dc from a 48 V dc input. The simulation results obtained from PSIM application interface were used to analyze the performance of the proposed converter. Transformer used in the circuit steps up the voltage as well as to provide electrical isolation between the low voltage and high voltage side. Since the converter involves high switching frequency of 100 kHz, ultrafast recovery diodes are employed in the circuitry. The major application of the project is for future modeling of solar powered electric hybrid cars.

  1. EUV Spectra of High Z Impurities from Large Helical Device and Atomic Data

    International Nuclear Information System (INIS)

    Kato, T.; Suzuki, C.; Funaba, H.; Sato, K.; Murakami, I.; Kato, D.; Sakaue, H.; O’Sullivan, G.; Harte, C.; White, J.; D’Arcy, R.; Tanuma, H.; Nakamura, N.

    2017-01-01

    The results of experiments on high Z impurity injection in the Large Helical Device at the National Institute for Fusion Science are described. Spectra from Xe, Sn and W ions were recorded in the extreme ultraviolet spectral region. Two different situations were observed in the case of Xe and Sn, depending on whether or not the plasma underwent radiative collapse. If the plasma was stable, the spectrum consisted of a number of strong lines and in both cases the strongest contribution was from 4p - 4d transitions of Cu-like ions. If the plasma underwent radiative collapse in each case it was dominated by an intense unresolved transition array with some strong lines overlapping it resulting from 4p 6 4d m - 4p 5 4d m+1 + 4p 6 4d m-1 4f transitions. For tungsten, radiative collapse was not observed though the spectrum here was dominated by the same array which lies between 4.5 and 7 nm with some additional contribution at the same wavelength from 4d 10 4f m - 4d 9 4f m+1 and 4d 10 4f m - 4d 10 4f m-1 5d transitions in lower stages also. From observation and comparison with other sources, it is shown that the spectra are dominated by resonance transitions to the ground state of the emitting ions, in marked contrast to results from charge exchange spectra that had been recorded to assist with ion stage separation. In the case of tungsten, no sharp lines are seen though the profile of the unresolved array structure changes with plasma temperature and the origin of these changes can be traced to differences in the populations of contributing ions. New assignments for lines of Xe XVIII, Sn XIX and Sn XVII of 4p - 4d transitions are listed in Tables. Strong lines of W, Xe and Sn ions in EUV range are also tabulated. (author)

  2. High efficiency multilayer blazed gratings for EUV and soft X-rays: Recent developments

    International Nuclear Information System (INIS)

    Voronov, Dmitriy; Ahn, Minseung; Anderson, Erik; Cambie, Rossana; Chang, Chih-Hao; Goray, Leonid; Gullikson, Eric; Heilmann, Ralf; Salmassi, Farhad; Schattenburg, Mark; Warwick, Tony; Yashchuk, Valeriy; Padmore, Howard

    2011-01-01

    Multilayer coated blazed gratings with high groove density are the best candidates for use in high resolution EUV and soft x-ray spectroscopy. Theoretical analysis shows that such a grating can be potentially optimized for high dispersion and spectral resolution in a desired high diffraction order without significant loss of diffraction efficiency. In order to realize this potential, the grating fabrication process should provide a perfect triangular groove profile and an extremely smooth surface of the blazed facets. Here we report on recent progress achieved at the Advanced Light Source (ALS) in fabrication of high quality multilayer coated blazed gratings. The blazed gratings were fabricated using scanning beam interference lithography followed by wet anisotropic etching of silicon. A 200 nm period grating coated with a Mo/Si multilayer composed with 30 bi-layers demonstrated an absolute efficiency of 37.6percent in the 3rd diffraction order at 13.6 nm wavelength. The groove profile of the grating was thoroughly characterized with atomic force microscopy before and after the multilayer deposition. The obtained metrology data were used for simulation of the grating efficiency with the vector electromagnetic PCGrate-6.1 code. The simulations showed that smoothing of the grating profile during the multilayer deposition is the main reason for efficiency losses compared to the theoretical maximum. Investigation of the grating with cross-sectional transmission electron microscopy revealed a complex evolution of the groove profile in the course of the multilayer deposition. Impact of the shadowing and smoothing processes on growth of the multilayer on the surface of the sawtooth substrate is discussed.

  3. Cloud based, Open Source Software Application for Mitigating Herbicide Drift

    Science.gov (United States)

    Saraswat, D.; Scott, B.

    2014-12-01

    The spread of herbicide resistant weeds has resulted in the need for clearly marked fields. In response to this need, the University of Arkansas Cooperative Extension Service launched a program named Flag the Technology in 2011. This program uses color-coded flags as a visual alert of the herbicide trait technology within a farm field. The flag based program also serves to help avoid herbicide misapplication and prevent herbicide drift damage between fields with differing crop technologies. This program has been endorsed by Southern Weed Science Society of America and is attracting interest from across the USA, Canada, and Australia. However, flags have risk of misplacement or disappearance due to mischief or severe windstorms/thunderstorms, respectively. This presentation will discuss the design and development of a cloud-based, free application utilizing open-source technologies, called Flag the Technology Cloud (FTTCloud), for allowing agricultural stakeholders to color code their farm fields for indicating herbicide resistant technologies. The developed software utilizes modern web development practices, widely used design technologies, and basic geographic information system (GIS) based interactive interfaces for representing, color-coding, searching, and visualizing fields. This program has also been made compatible for a wider usability on different size devices- smartphones, tablets, desktops and laptops.

  4. Low-k films modification under EUV and VUV radiation

    International Nuclear Information System (INIS)

    Rakhimova, T V; Rakhimov, A T; Mankelevich, Yu A; Lopaev, D V; Kovalev, A S; Vasil'eva, A N; Zyryanov, S M; Kurchikov, K; Proshina, O V; Voloshin, D G; Novikova, N N; Krishtab, M B; Baklanov, M R

    2014-01-01

    Modification of ultra-low-k films by extreme ultraviolet (EUV) and vacuum ultraviolet (VUV) emission with 13.5, 58.4, 106, 147 and 193 nm wavelengths and fluences up to 6 × 10 18  photons cm −2 is studied experimentally and theoretically to reveal the damage mechanism and the most ‘damaging’ spectral region. Organosilicate glass (OSG) and organic low-k films with k-values of 1.8–2.5 and porosity of 24–51% are used in these experiments. The Si–CH 3 bonds depletion is used as a criterion of VUV damage of OSG low-k films. It is shown that the low-k damage is described by two fundamental parameters: photoabsorption (PA) cross-section σ PA and effective quantum yield φ of Si–CH 3 photodissociation. The obtained σ PA and φ values demonstrate that the effect of wavelength is defined by light absorption spectra, which in OSG materials is similar to fused silica. This is the reason why VUV light in the range of ∼58–106 nm having the highest PA cross-sections causes strong Si–CH 3 depletion only in the top part of the films (∼50–100 nm). The deepest damage is observed after exposure to 147 nm VUV light since this emission is located at the edge of Si–O absorption, has the smallest PA cross-section and provides extensive Si–CH 3 depletion over the whole film thickness. The effective quantum yield slowly increases with the increasing porosity but starts to grow quickly when the porosity exceeds the critical threshold located close to a porosity of ∼50%. The high degree of pore interconnectivity of these films allows easy movement of the detached methyl radicals. The obtained results have a fundamental character and can be used for prediction of ULK material damage under VUV light with different wavelengths. (paper)

  5. Fabrication of nanoscale patterns in lithium fluoride crystal using a 13.5 nm Schwarzschild objective and a laser produced plasma source

    International Nuclear Information System (INIS)

    Wang Xin; Mu Baozhong; Jiang Li; Zhu Jingtao; Yi Shengzhen; Wang Zhanshan; He Pengfei

    2011-01-01

    Lithium fluoride (LiF) crystal is a radiation sensitive material widely used as EUV and soft x-ray detector. The LiF-based detector has high resolution, in principle limited by the point defect size, large field of view, and wide dynamic range. Using LiF crystal as an imaging detector, a resolution of 900 nm was achieved by a projection imaging of test meshes with a Schwarzschild objective operating at 13.5 nm. In addition, by imaging of a pinhole illuminated by the plasma, an EUV spot of 1.5 μm diameter in the image plane of the objective was generated, which accomplished direct writing of color centers with resolution of 800 nm. In order to avoid sample damage and contamination due to the influence of huge debris flux produced by the plasma source, a spherical normal-incidence condenser was used to collect EUV radiation. Together with a description of experimental results, the development of the Schwarzschild objective, the influence of condenser on energy density and the alignment of the imaging system are also reported.

  6. Microflown based monopole sound sources for reciprocal measurements

    NARCIS (Netherlands)

    Bree, H.E. de; Basten, T.G.H.

    2008-01-01

    Monopole sound sources (i.e. omni directional sound sources with a known volume velocity) are essential for reciprocal measurements used in vehicle interior panel noise contribution analysis. Until recently, these monopole sound sources use a sound pressure transducer sensor as a reference sensor. A

  7. Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source.

    Science.gov (United States)

    Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

    2007-03-01

    A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 microm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2 x 10(11) Wcm(2) with a spot diameter of 175 microm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

  8. Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source

    Science.gov (United States)

    Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

    2007-03-01

    A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 μm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2×1011 W/cm2 with a spot diameter of 175 μm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

  9. Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source

    International Nuclear Information System (INIS)

    Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

    2007-01-01

    A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 μm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2x10 11 W/cm 2 with a spot diameter of 175 μm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal

  10. High performance EUV multilayer structures insensitive to capping layer optical parameters.

    Science.gov (United States)

    Pelizzo, Maria Guglielmina; Suman, Michele; Monaco, Gianni; Nicolosi, Piergiorgio; Windt, David L

    2008-09-15

    We have designed and tested a-periodic multilayer structures containing protective capping layers in order to obtain improved stability with respect to any possible changes of the capping layer optical properties (due to oxidation and contamination, for example)-while simultaneously maximizing the EUV reflection efficiency for specific applications, and in particular for EUV lithography. Such coatings may be particularly useful in EUV lithographic apparatus, because they provide both high integrated photon flux and higher stability to the harsh operating environment, which can affect seriously the performance of the multilayer-coated projector system optics. In this work, an evolutive algorithm has been developed in order to design these a-periodic structures, which have been proven to have also the property of stable performance with respect to random layer thickness errors that might occur during coating deposition. Prototypes have been fabricated, and tested with EUV and X-ray reflectometry, and secondary electron spectroscopy. The experimental results clearly show improved performance of our new a-periodic coatings design compared with standard periodic multilayer structures.

  11. EUV observations of the active Sun from the Havard experiment on ATM

    International Nuclear Information System (INIS)

    Noyes, R.W.; Foukal, P.V.; Huber, M.C.E.; Reeves, E.M.; Schmahl, E.J.; Timothy, J.G.; Vernazza, J.E.; Withbroe, G.L.

    1975-01-01

    The authors review some preliminary results from the Harvard College Observatory Extreme Ultraviolet Spectroheliometer on ATM that pertain to solar activity. The results reviewed are described in more detail in other papers referred to in the text. They first describe the instrument and its capabilities, and then turm to results on active regions, sunspots, flares, EUV bright points, coronal holes, and prominences. (Auth.)

  12. Direct EUV/X-Ray Modulation of the Ionosphere During the August 2017 Total Solar Eclipse

    Science.gov (United States)

    Mrak, Sebastijan; Semeter, Joshua; Drob, Douglas; Huba, J. D.

    2018-05-01

    The great American total solar eclipse of 21 August 2017 offered a fortuitous opportunity to study the response of the atmosphere and ionosphere using a myriad of ground instruments. We have used the network of U.S. Global Positioning System receivers to examine perturbations in maps of ionospheric total electron content (TEC). Coherent large-scale variations in TEC have been interpreted by others as gravity wave-induced traveling ionospheric disturbances. However, the solar disk had two active regions at that time, one near the center of the disk and one at the edge, which resulted in an irregular illumination pattern in the extreme ultraviolet (EUV)/X-ray bands. Using detailed EUV occultation maps calculated from the National Aeronautics and Space Administration Solar Dynamics Observatory Atmospheric Imaging Assembly images, we show excellent agreement between TEC perturbations and computed gradients in EUV illumination. The results strongly suggest that prominent large-scale TEC disturbances were consequences of direct EUV modulation, rather than gravity wave-induced traveling ionospheric disturbances.

  13. RapidNano: towards 20nm Particle Detection on EUV Mask Blanks

    NARCIS (Netherlands)

    Donck, J.C.J. van der; Bussink, P.G.W.; Fritz, E.C.; Walle, P. van der

    2016-01-01

    Cleanliness is a prerequisite for obtaining economically feasible yield levels in the semiconductor industry. For the next generation of lithographic equipment, EUV lithography, the size of yield-loss inducing particles for the masks will be smaller than 20 nm. Consequently, equipment for handling

  14. Reflectance Tuning at Extreme Ultraviolet (EUV) Wavelengths with Active Multilayer Mirrors

    NARCIS (Netherlands)

    Bayraktar, Muharrem; Lee, Christopher James; van Goor, F.A.; Koster, Gertjan; Rijnders, Augustinus J.H.M.; Bijkerk, Frederik

    2011-01-01

    At extreme ultraviolet (EUV) wavelengths the refractive power of transmission type optical components is limited, therefore reflective components are used. Reflective optics (multilayer mirrors) usually consist of many bilayers and each bilayer is composed of a high and a low refractive index

  15. Reflectivity and surface roughness of multilayer-coated substrate recovery layers for EUV lithographic optics

    NARCIS (Netherlands)

    Nedelcu, I.; van de Kruijs, R.W.E.; Yakshin, A. E.; von Blanckenhagen, G.; F. Bijkerk,

    2008-01-01

    We investigated the use of separation, or substrate recovery, layers (SRLs), to enable the reuse of optical substrates after the deposition of multilayer reflective coatings, in particular Mo/Si multilayers as used for EUV lithography. An organic material (polyimide), known from other work to reduce

  16. Monitoring Hydraulic Fracturing Using Ground-Based Controlled Source Electromagnetics

    Science.gov (United States)

    Hickey, M. S.; Trevino, S., III; Everett, M. E.

    2017-12-01

    Hydraulic fracturing allows hydrocarbon production in low permeability formations. Imaging the distribution of fluid used to create a hydraulic fracture can aid in the characterization of fracture properties such as extent of plume penetration as well as fracture azimuth and symmetry. This could contribute to improving the efficiency of an operation, for example, in helping to determine ideal well spacing or the need to refracture a zone. A ground-based controlled-source electromagnetics (CSEM) technique is ideal for imaging the fluid due to the change in field caused by the difference in the conductive properties of the fluid when compared to the background. With advances in high signal to noise recording equipment, coupled with a high-power, broadband transmitter we can show hydraulic fracture extent and azimuth with minimal processing. A 3D finite element code is used to model the complete well casing along with the layered subsurface. This forward model is used to optimize the survey design and isolate the band of frequencies with the best response. In the field, the results of the modeling are also used to create a custom pseudorandom numeric (PRN) code to control the frequencies transmitted through a grounded dipole source. The receivers record the surface voltage across two grounded dipoles, one parallel and one perpendicular to the transmitter. The data are presented as the displays of amplitude ratios across several frequencies with the associated spatial information. In this presentation, we show multiple field results in multiple basins in the United States along with the CSEM theory used to create the survey designs.

  17. Latest developments on EUV reticle and pellicle research and technology at TNO

    Science.gov (United States)

    Verberk, Rogier; Koster, Norbert; te Sligte, Edwin; Staring, Wilbert

    2017-06-01

    At TNO an extensive EUV optics life time program has been running for over 15 years together with our partners ASML and Carl Zeiss. This has contributed to the upcoming introduction of EUV High Volume Manufacturing (HVM). To further help the industry with the introduction of EUV, TNO has worked on extending their facilities with a number of reticle and pellicle research infrastructure facilities. In this paper we will show some of the facilities that are available at TNO and shortly introduce their capabilities. Recently we have opened our EBL2 facility, which is an EUV Beam Line (EBL2) meant for studying the effects of high power EUV illumination on optics, reticles and pellicles up to the power roadmap of 500 W at intermediate Focus (IF). This facility is open to users from all over the world and is beneficial for the industry in helping developing alternative capping layers and contamination control strategies for optics lifetime, new absorber materials, pellicles and resists. The EBL2 system has seen first light in December 2016 and is now in the final stage of acceptance testing and qualification. It is expected that the system will be fully operational in the third quarter of 2017, and available for users. It is possible to transfer reticles to and from the EBL2 by means of the reticle handler using the dual pod interface. This secures backside cleanliness to NXE standards and thus enables wafer printing on a NXE tool in a later stage after the exposures and inspection at EBL2. Besides EBL2, a high performance and ultra-clean reticle handler is available at TNO. This handler incorporates our particle scanner Rapid Nano 4 for front side inspection of reticle blanks with a detection limit down to 20 nm particles. Attached to the handler is also an Optical Coherence Tomography (OCT) inspection tool for back-side reticle or pellicle inspection with a resolution down to 1 micron.

  18. Digital time stamping system based on open source technologies.

    Science.gov (United States)

    Miskinis, Rimantas; Smirnov, Dmitrij; Urba, Emilis; Burokas, Andrius; Malysko, Bogdan; Laud, Peeter; Zuliani, Francesco

    2010-03-01

    A digital time stamping system based on open source technologies (LINUX-UBUNTU, OpenTSA, OpenSSL, MySQL) is described in detail, including all important testing results. The system, called BALTICTIME, was developed under a project sponsored by the European Commission under the Program FP 6. It was designed to meet the requirements posed to the systems of legal and accountable time stamping and to be applicable to the hardware commonly used by the national time metrology laboratories. The BALTICTIME system is intended for the use of governmental and other institutions as well as personal bodies. Testing results demonstrate that the time stamps issued to the user by BALTICTIME and saved in BALTICTIME's archives (which implies that the time stamps are accountable) meet all the regulatory requirements. Moreover, the BALTICTIME in its present implementation is able to issue more than 10 digital time stamps per second. The system can be enhanced if needed. The test version of the BALTICTIME service is free and available at http://baltictime. pfi.lt:8080/btws/ and http://baltictime.lnmc.lv:8080/btws/.

  19. Observation of Neutron Skyshine from an Accelerator Based Neutron Source

    Energy Technology Data Exchange (ETDEWEB)

    Franklyn, C. B. [Radiation Science Department, Necsa, PO Box 582, Pretoria 0001 (South Africa)

    2011-12-13

    A key feature of neutron based interrogation systems is the need for adequate provision of shielding around the facility. Accelerator facilities adapted for fast neutron generation are not necessarily suitably equipped to ensure complete containment of the vast quantity of neutrons generated, typically >10{sup 11} n{center_dot}s{sup -1}. Simulating the neutron leakage from a facility is not a simple exercise since the energy and directional distribution can only be approximated. Although adequate horizontal, planar shielding provision is made for a neutron generator facility, it is sometimes the case that vertical shielding is minimized, due to structural and economic constraints. It is further justified by assuming the atmosphere above a facility functions as an adequate radiation shield. It has become apparent that multiple neutron scattering within the atmosphere can result in a measurable dose of neutrons reaching ground level some distance from a facility, an effect commonly known as skyshine. This paper describes a neutron detection system developed to monitor neutrons detected several hundred metres from a neutron source due to the effect of skyshine.

  20. Compact X-ray source based on Compton backscattering

    CERN Document Server

    Bulyak, E V; Zelinsky, A; Karnaukhov, I; Kononenko, S; Lapshin, V G; Mytsykov, A; Telegin, Yu P; Khodyachikh, A; Shcherbakov, A; Molodkin, V; Nemoshkalenko, V; Shpak, A

    2002-01-01

    The feasibility study of an intense X-ray source based on the interaction between the electron beam in a compact storage ring and the laser pulse accumulated in an optical resonator is carried out. We propose to reconstruct the 160 MeV electron storage ring N-100, which was shutdown several years ago. A new magnetic lattice will provide a transverse of electron beam size of approx 35 mu m at the point of electron beam-laser beam interaction. The proposed facility is to generate X-ray beams of intensity approx 2.6x10 sup 1 sup 4 s sup - sup 1 and spectral brightness approx 10 sup 1 sup 2 phot/0.1%bw/s/mm sup 2 /mrad sup 2 in the energy range from 10 keV up to 0.5 MeV. These X-ray beam parameters meet the requirements for most of technological and scientific applications. Besides, we plan to use the new facility for studying the laser cooling effect.

  1. Compact X-ray source based on Compton backscattering

    Energy Technology Data Exchange (ETDEWEB)

    Bulyak, E.; Gladkikh, P.; Zelinsky, A. E-mail: zelinsky@kipt.kharkov.ua; Karnaukhov, I.; Kononenko, S.; Lapshin, V.; Mytsykov, A.; Telegin, Yu.; Khodyachikh, A.; Shcherbakov, A.; Molodkin, V.; Nemoshkalenko, V.; Shpak, A

    2002-07-21

    The feasibility study of an intense X-ray source based on the interaction between the electron beam in a compact storage ring and the laser pulse accumulated in an optical resonator is carried out. We propose to reconstruct the 160 MeV electron storage ring N-100, which was shutdown several years ago. A new magnetic lattice will provide a transverse of electron beam size of {approx}35 {mu}m at the point of electron beam-laser beam interaction. The proposed facility is to generate X-ray beams of intensity {approx}2.6x10{sup 14} s{sup -1} and spectral brightness {approx}10{sup 12} phot/0.1%bw/s/mm{sup 2}/mrad{sup 2} in the energy range from 10 keV up to 0.5 MeV. These X-ray beam parameters meet the requirements for most of technological and scientific applications. Besides, we plan to use the new facility for studying the laser cooling effect.

  2. An MHD heat source based on intermetallic reactions

    Energy Technology Data Exchange (ETDEWEB)

    Sadjian, H.; Zavitsanos, P. (General Sciences, Inc., Souderton, PA (United States)); Marston, C.H. (Villanova Univ., PA (United States))

    1991-05-06

    The main objective of this program was the development of an MHD heat source of potential use in Space - Based Multi Megawatt, MHD Power Systems. The approach is based on extension of high temperature chemical/ion release technology developed by the General Sciences, Incorporated (GSI) team and successfully applied in other Space Applications. Solid state reactions have been identified which can deliver energy densities and electrons in excess of those from high energy explosives as well as other conventional fuels. The use of intermetallic reactions can be used to generate hot hydrogen plasma from the reaction, to create a high level of seedant ionization, can be packaged as a cartridge type fuels for discrete pulses. The estimated weight for energizing a (100 MW - 1000 sec) Pulsed MHD Power System can range from 12 to 25 {times} 10{sup 3} kg depending on reaction system and strength of the magnetic field. The program consisted of two major tasks with eight subtasks designed to systematically evaluate these concepts in order to reduce fuel weight requirements. Laboratory measurements on energy release, reaction product identification and levels of ionization were conducted in the first task to screen candidate fuels. The second task addressed the development of a reaction chamber in which conductivity, temperature and pressure were measured. Instrumentation was developed to measure these parameters under high temperature pulsed conditions in addition to computer programs to reduce the raw data. Measurements were conducted at GSI laboratories for fuel weights of up to 120 grams and at the Franklin Research Center* for fuel weights up to 1 kilogram. The results indicate that fuel weight can be scaled using modular packaging. Estimates are presented for fuel weight requirements. 15 refs.

  3. A primer on polymer nomenclature: Structure-based, sourced-based and trade names

    Science.gov (United States)

    Polymer nomenclature is important because it is part of the language of polymer science and is needed for polymer identification, reference, and documentation. A primer on polymer nomenclature is provided herein for people new to the field or for instructional use. Both structure-based and source-...

  4. A Source Anonymity-Based Lightweight Secure AODV Protocol for Fog-Based MANET.

    Science.gov (United States)

    Fang, Weidong; Zhang, Wuxiong; Xiao, Jinchao; Yang, Yang; Chen, Wei

    2017-06-17

    Fog-based MANET (Mobile Ad hoc networks) is a novel paradigm of a mobile ad hoc network with the advantages of both mobility and fog computing. Meanwhile, as traditional routing protocol, ad hoc on-demand distance vector (AODV) routing protocol has been applied widely in fog-based MANET. Currently, how to improve the transmission performance and enhance security are the two major aspects in AODV's research field. However, the researches on joint energy efficiency and security seem to be seldom considered. In this paper, we propose a source anonymity-based lightweight secure AODV (SAL-SAODV) routing protocol to meet the above requirements. In SAL-SAODV protocol, source anonymous and secure transmitting schemes are proposed and applied. The scheme involves the following three parts: the source anonymity algorithm is employed to achieve the source node, without being tracked and located; the improved secure scheme based on the polynomial of CRC-4 is applied to substitute the RSA digital signature of SAODV and guarantee the data integrity, in addition to reducing the computation and energy consumption; the random delayed transmitting scheme (RDTM) is implemented to separate the check code and transmitted data, and achieve tamper-proof results. The simulation results show that the comprehensive performance of the proposed SAL-SAODV is a trade-off of the transmission performance, energy efficiency, and security, and better than AODV and SAODV.

  5. Concept for Risk-based Prioritisation of Point Sources

    DEFF Research Database (Denmark)

    Overheu, N.D.; Troldborg, Mads; Tuxen, N.

    2010-01-01

    estimates on a local scale from all the sources, and 3D catchment-scale fate and transport modelling. It handles point sources at various knowledge levels and accounts for uncertainties. The tool estimates the impacts on the water supply in the catchment and provides an overall prioritisation of the sites...

  6. Journalistic Sources: Conceptual bases for a digital system

    Directory of Open Access Journals (Sweden)

    Walter Teixeira Lima Junior

    2006-12-01

    Full Text Available This article contains definitions of concepts and a bibliographical revision of the fi rst part of the post-doctorate research work which aims at the production of software for the search for and qualitative validation of journalistic sources of information. The text touches on biological memory, decision-making and fundamental concepts for the choice of a journalistic source: nature of the source, credibility, prestige and currency. These aspects permeate and infl uence the choice (decision-making of the professional who needs a source to carry out his work. They are classifi ed, categorized, structured and interrelated, in order to serve as consolidated, reliable parameters for software to perform the task of selection of the best journalistic sources without the mistakes/problems pointed out by researchers in the area.

  7. Resist-based measurement of contrast transfer function in a 0.3-NA microfield optic

    International Nuclear Information System (INIS)

    Cain, Jason P.; Naulleau, Patrick; Spanos, Costas J.

    2005-01-01

    Although extreme ultraviolet (EUV) lithography offers the possibility of very high-resolution patterning, the projection optics must be of extremely high quality in order to meet this potential. One key metric of the projection optic quality is the contrast transfer function (CTF), which is a measure of the aerial image contrast as a function of pitch. A static microfield exposure tool based on the 0.3-NA MET optic and operating at a wavelength of 13.5 nm has been installed at the Advanced Light Source, a synchrotron facility at the Lawrence Berkeley National Laboratory. This tool provides a platform for a wide variety of research into EUV lithography. In this work we present resist-based measurements of the contrast transfer function for the MET optic. These measurements are based upon line/space patterns printed in several different EUV photoresists. The experimental results are compared with the CTF in aerial-image simulations using the aberrations measured in the projection optic using interferometry. In addition, the CTF measurements are conducted for both bright-field and dark-field mask patterns. Finally, the orientation dependence of the CTF is measured in order to evaluate the effect of non-rotationally symmetric lens aberrations. These measurements provide valuable information in interpreting the results of other experiments performed using the MET and similar systems

  8. Source-based neurofeedback methods using EEG recordings: training altered brain activity in a functional brain source derived from blind source separation

    Science.gov (United States)

    White, David J.; Congedo, Marco; Ciorciari, Joseph

    2014-01-01

    A developing literature explores the use of neurofeedback in the treatment of a range of clinical conditions, particularly ADHD and epilepsy, whilst neurofeedback also provides an experimental tool for studying the functional significance of endogenous brain activity. A critical component of any neurofeedback method is the underlying physiological signal which forms the basis for the feedback. While the past decade has seen the emergence of fMRI-based protocols training spatially confined BOLD activity, traditional neurofeedback has utilized a small number of electrode sites on the scalp. As scalp EEG at a given electrode site reflects a linear mixture of activity from multiple brain sources and artifacts, efforts to successfully acquire some level of control over the signal may be confounded by these extraneous sources. Further, in the event of successful training, these traditional neurofeedback methods are likely influencing multiple brain regions and processes. The present work describes the use of source-based signal processing methods in EEG neurofeedback. The feasibility and potential utility of such methods were explored in an experiment training increased theta oscillatory activity in a source derived from Blind Source Separation (BSS) of EEG data obtained during completion of a complex cognitive task (spatial navigation). Learned increases in theta activity were observed in two of the four participants to complete 20 sessions of neurofeedback targeting this individually defined functional brain source. Source-based EEG neurofeedback methods using BSS may offer important advantages over traditional neurofeedback, by targeting the desired physiological signal in a more functionally and spatially specific manner. Having provided preliminary evidence of the feasibility of these methods, future work may study a range of clinically and experimentally relevant brain processes where individual brain sources may be targeted by source-based EEG neurofeedback. PMID

  9. Matlab Geochemistry: An open source geochemistry solver based on MRST

    Science.gov (United States)

    McNeece, C. J.; Raynaud, X.; Nilsen, H.; Hesse, M. A.

    2017-12-01

    The study of geological systems often requires the solution of complex geochemical relations. To address this need we present an open source geochemical solver based on the Matlab Reservoir Simulation Toolbox (MRST) developed by SINTEF. The implementation supports non-isothermal multicomponent aqueous complexation, surface complexation, ion exchange, and dissolution/precipitation reactions. The suite of tools available in MRST allows for rapid model development, in particular the incorporation of geochemical calculations into transport simulations of multiple phases, complex domain geometry and geomechanics. Different numerical schemes and additional physics can be easily incorporated into the existing tools through the object-oriented framework employed by MRST. The solver leverages the automatic differentiation tools available in MRST to solve arbitrarily complex geochemical systems with any choice of species or element concentration as input. Four mathematical approaches enable the solver to be quite robust: 1) the choice of chemical elements as the basis components makes all entries in the composition matrix positive thus preserving convexity, 2) a log variable transformation is used which transfers the nonlinearity to the convex composition matrix, 3) a priori bounds on variables are calculated from the structure of the problem, constraining Netwon's path and 4) an initial guess is calculated implicitly by sequentially adding model complexity. As a benchmark we compare the model to experimental and semi-analytic solutions of the coupled salinity-acidity transport system. Together with the reservoir simulation capabilities of MRST the solver offers a promising tool for geochemical simulations in reservoir domains for applications in a diversity of fields from enhanced oil recovery to radionuclide storage.

  10. Salmonella source attribution based on microbial subtyping

    DEFF Research Database (Denmark)

    Barco, Lisa; Barrucci, Federica; Olsen, John Elmerdahl

    2013-01-01

    Source attribution of cases of food-borne disease represents a valuable tool for identifying and prioritizing effective food-safety interventions. Microbial subtyping is one of the most common methods to infer potential sources of human food-borne infections. So far, Salmonella microbial subtyping...... source attribution through microbial subtyping approach. It summarizes the available microbial subtyping attribution models and discusses the use of conventional phenotypic typing methods, as well as of the most commonly applied molecular typing methods in the European Union (EU) laboratories...

  11. Accuracy of Dual-Energy Virtual Monochromatic CT Numbers: Comparison between the Single-Source Projection-Based and Dual-Source Image-Based Methods.

    Science.gov (United States)

    Ueguchi, Takashi; Ogihara, Ryota; Yamada, Sachiko

    2018-03-21

    To investigate the accuracy of dual-energy virtual monochromatic computed tomography (CT) numbers obtained by two typical hardware and software implementations: the single-source projection-based method and the dual-source image-based method. A phantom with different tissue equivalent inserts was scanned with both single-source and dual-source scanners. A fast kVp-switching feature was used on the single-source scanner, whereas a tin filter was used on the dual-source scanner. Virtual monochromatic CT images of the phantom at energy levels of 60, 100, and 140 keV were obtained by both projection-based (on the single-source scanner) and image-based (on the dual-source scanner) methods. The accuracy of virtual monochromatic CT numbers for all inserts was assessed by comparing measured values to their corresponding true values. Linear regression analysis was performed to evaluate the dependency of measured CT numbers on tissue attenuation, method, and their interaction. Root mean square values of systematic error over all inserts at 60, 100, and 140 keV were approximately 53, 21, and 29 Hounsfield unit (HU) with the single-source projection-based method, and 46, 7, and 6 HU with the dual-source image-based method, respectively. Linear regression analysis revealed that the interaction between the attenuation and the method had a statistically significant effect on the measured CT numbers at 100 and 140 keV. There were attenuation-, method-, and energy level-dependent systematic errors in the measured virtual monochromatic CT numbers. CT number reproducibility was comparable between the two scanners, and CT numbers had better accuracy with the dual-source image-based method at 100 and 140 keV. Copyright © 2018 The Association of University Radiologists. Published by Elsevier Inc. All rights reserved.

  12. Normal incidence spectrophotometer using high density transmission grating technology and highly efficiency silicon photodiodes for absolute solar EUV irradiance measurements

    Science.gov (United States)

    Ogawa, H. S.; Mcmullin, D.; Judge, D. L.; Korde, R.

    1992-01-01

    New developments in transmission grating and photodiode technology now make it possible to realize spectrometers in the extreme ultraviolet (EUV) spectral region (wavelengths less than 1000 A) which are expected to be virtually constant in their diffraction and detector properties. Time dependent effects associated with reflection gratings are eliminated through the use of free standing transmission gratings. These gratings together with recently developed and highly stable EUV photodiodes have been utilized to construct a highly stable normal incidence spectrophotometer to monitor the variability and absolute intensity of the solar 304 A line. Owing to its low weight and compactness, such a spectrometer will be a valuable tool for providing absolute solar irradiance throughout the EUV. This novel instrument will also be useful for cross-calibrating other EUV flight instruments and will be flown on a series of Hitchhiker Shuttle Flights and on SOHO. A preliminary version of this instrument has been fabricated and characterized, and the results are described.

  13. Uncooled Radiation Hard Large Area SiC X-ray and EUV Detectors and 2D Arrays, Phase II

    Data.gov (United States)

    National Aeronautics and Space Administration — This project seeks to design, fabricate, characterize and commercialize large area, uncooled and radiative hard 4H-SiC EUV ? soft X-ray detectors capable of ultra...

  14. Improvement of proton source based on cylindrical inertial electrostatic confinement fusion with ion source

    International Nuclear Information System (INIS)

    Yamauchi, Kunihito; Ohura, Sonoe; Tashiro, Atsushi; Watanabe, Masato; Okino, Akitoshi; Kohno, Toshiyuki; Hotta, Eiki; Yuura, Morimasa

    2005-01-01

    Inertial Electrostatic Confinement Fusion (IECF) device is a compact fusion proton/neutron source with an extremely simple configuration, high controllability, and hence high safety. Therefore, it has been studied for practical use as a portable neutron/proton source for various applications such as landmine detection and medical positron emission tomography. However, some problems remain for the practical use, and the most critical one is the insufficiency of absolute neutron/proton yields. In this study, a new IECF device was designed and tested to obtain high neutron/proton yields. The key features of the new device are the cylindrical electrode configuration in consideration of better electrostatic confinement of ions and extraction of protons, and an integrated ion source that consists of sixteen ferrite magnets and biasing the grid anode. To investigate the performance characteristics of the device and the effect of the ion source, three kinds of experimental setup were used for comparison. At first, the device was operated with the basic setup. Then a cusp magnetic field was applied by using ferrite magnets, and the grid anode was negatively biased. As a result, it was confirmed that the ion source works effectively. At the same voltage and current, the obtained neutron production rate was about one order of magnitude higher than that of the conventional spherical IECF device. The maximum neutron production rate of 6.8x10 9 n/s was obtained at a pulsed discharge of -70 kV and 10 A with an anode bias voltage of -1.0 kV. (author)

  15. Modelling of novel light sources based on asymmetric heterostructures

    International Nuclear Information System (INIS)

    Afonenko, A.A.; Kononenko, V.K.; Manak, I.S.

    1995-01-01

    For asymmetric quantum-well heterojunction laser sources, processes of carrier injection into quantum wells are considered. In contrast to ordinary quantum-well light sources, active layers in the novel nanocrystalline systems have different thickness and/or compositions. In addition, wide-band gap barrier layers separating the quantum wells may have a linear or parabolic energy potential profile. For various kinds of the structures, mathematical simulation of dynamic response has been carried out. (author). 8 refs, 5 figs

  16. SPECIEUROPE: The European data base for PM source profiles

    OpenAIRE

    PERNIGOTTI DENISE; BELIS CLAUDIO; SPANO' LUCA

    2015-01-01

    A database of atmospheric particulate matter emission source profiles in Europe (SPECIEUROPE) was developed by the Joint Research Center in the framework of the Forum for air quality modeling in Europe (FAIRMODE, Working Group 3). It contains the chemical composition of particulate matter (PM) emission sources reported in the scientific literature and reports drafted by competent authorities. The first release of SPECIEUROPE consists of 151 measured profiles (original), 13 composite (merging ...

  17. Prospects of Source-Separation-Based Sanitation Concepts: A Model-Based Study

    Directory of Open Access Journals (Sweden)

    Cees Buisman

    2013-07-01

    Full Text Available Separation of different domestic wastewater streams and targeted on-site treatment for resource recovery has been recognized as one of the most promising sanitation concepts to re-establish the balance in carbon, nutrient and water cycles. In this study a model was developed based on literature data to compare energy and water balance, nutrient recovery, chemical use, effluent quality and land area requirement in four different sanitation concepts: (1 centralized; (2 centralized with source-separation of urine; (3 source-separation of black water, kitchen refuse and grey water; and (4 source-separation of urine, feces, kitchen refuse and grey water. The highest primary energy consumption of 914 MJ/capita(cap/year was attained within the centralized sanitation concept, and the lowest primary energy consumption of 437 MJ/cap/year was attained within source-separation of urine, feces, kitchen refuse and grey water. Grey water bio-flocculation and subsequent grey water sludge co-digestion decreased the primary energy consumption, but was not energetically favorable to couple with grey water effluent reuse. Source-separation of urine improved the energy balance, nutrient recovery and effluent quality, but required larger land area and higher chemical use in the centralized concept.

  18. Non-Potential Magnetic Fields and Magnetic Reconnection In Low Collisional Plasmas-Discovery of Solar EUV Mini-Sigmoids and Development of Novel In-Space Propulsion Systems

    Science.gov (United States)

    Chesny, David

    Magnetic reconnection is the source of many of the most powerful explosions of astrophysical plasmas in the universe. Blazars, magnetars, stellar atmospheres, and planetary magnetic fields have all been shown to be primary sites of strong reconnection events. For studying the fundamental physics behind this process, the solar atmosphere is our most accessible laboratory setting. Magnetic reconnection resulting from non-potential fields leads to plasma heating and particle acceleration, often in the form of explosive activity, contributing to coronal heating and the solar wind. Large-scale non-potential (sigmoid) fields in the solar atmosphere are poorly understood due to their crowded neighborhoods. For the first time, small-scale, non-potential loop structures have been observed in quiet Sun EUV observations. Fourteen unique mini-sigmoid events and three diffuse non-potential loops have been discovered, suggesting a multi-scaled self-similarity in the sigmoid formation process. These events are on the order of 10 arcseconds in length and do not appear in X-ray emissions, where large-scale sigmoids are well documented. We have discovered the first evidence of sigmoidal structuring in EUV bright point phenomena, which are prolific events in the solar atmosphere. Observations of these mini-sigmoids suggest that they are being formed via tether-cutting reconnection, a process observed to occur at active region scales. Thus, tether-cutting is suggested to be ubiquitous throughout the solar atmosphere. These dynamics are shown to be a function of the free magnetic energy in the quiet Sun network. Recently, the reconnection process has been reproduced in Earth-based laboratory tokamaks. Easily achievable magnetic field configurations can induce reconnection and result in ion acceleration. Here, magnetic reconnection is utilized as the plasma acceleration mechanism for a theoretical propulsion system. The theory of torsional spine reconnection is shown to result in ion

  19. Comparing source-based and gist-based false recognition in aging and Alzheimer's disease.

    Science.gov (United States)

    Pierce, Benton H; Sullivan, Alison L; Schacter, Daniel L; Budson, Andrew E

    2005-07-01

    This study examined 2 factors contributing to false recognition of semantic associates: errors based on confusion of source and errors based on general similarity information or gist. The authors investigated these errors in patients with Alzheimer's disease (AD), age-matched control participants, and younger adults, focusing on each group's ability to use recollection of source information to suppress false recognition. The authors used a paradigm consisting of both deep and shallow incidental encoding tasks, followed by study of a series of categorized lists in which several typical exemplars were omitted. Results showed that healthy older adults were able to use recollection from the deep processing task to some extent but less than that used by younger adults. In contrast, false recognition in AD patients actually increased following the deep processing task, suggesting that they were unable to use recollection to oppose familiarity arising from incidental presentation. (c) 2005 APA, all rights reserved.

  20. A method to analyze "source-sink" structure of non-point source pollution based on remote sensing technology.

    Science.gov (United States)

    Jiang, Mengzhen; Chen, Haiying; Chen, Qinghui

    2013-11-01

    With the purpose of providing scientific basis for environmental planning about non-point source pollution prevention and control, and improving the pollution regulating efficiency, this paper established the Grid Landscape Contrast Index based on Location-weighted Landscape Contrast Index according to the "source-sink" theory. The spatial distribution of non-point source pollution caused by Jiulongjiang Estuary could be worked out by utilizing high resolution remote sensing images. The results showed that, the area of "source" of nitrogen and phosphorus in Jiulongjiang Estuary was 534.42 km(2) in 2008, and the "sink" was 172.06 km(2). The "source" of non-point source pollution was distributed mainly over Xiamen island, most of Haicang, east of Jiaomei and river bank of Gangwei and Shima; and the "sink" was distributed over southwest of Xiamen island and west of Shima. Generally speaking, the intensity of "source" gets weaker along with the distance from the seas boundary increase, while "sink" gets stronger. Copyright © 2013 Elsevier Ltd. All rights reserved.

  1. Development of radioactive source scanner based on PLC

    International Nuclear Information System (INIS)

    Yang Guogui; Gao Xiang; Guo Hongli

    2013-01-01

    The radioactive radial uniformity of 68 Ge line radioactive sources is a critical quality parameter. The radioactive source scanner with linear scanning function is developed by making use of high-speed pulse counters, high-speed pulse output ports, and the powerful instruction system of Siemens S7-200 series programmable logic controller (PLC). A computer used as a host computer of the instrument communicate with. the PLC by point to point interface (PPI) protocol, The instrument with functions of data collection, transmission, displaying, saving, motion control and instrument parameter settings, can be used to measure the radioactive radial uniformity and total activity of line radioactive source. The advantages of Using the PLC to develop nuclear instrumentation are development speed, strong anti-interference ability, and low-cost. This paper mainly describes the control system implementation and feature of the instrument. (authors)

  2. A Carbon Nanotube Electron Source Based Ionization Vacuum Gauge

    Energy Technology Data Exchange (ETDEWEB)

    Changkun Dong; Ganapati Myneni

    2003-10-01

    The results of fabrication and performance of an ionization vacuum gauge using a carbon nanotube (CNT) electron source are presented. The electron source was constructed with multi-wall nanotubes (MWNT), which were grown using thermal chemical vapor deposition (CVD) process. The electron emission of the source was stable in vacuum pressure up to 10-7 Torr, which is better than the metal field emitters. The measurement linearity of the gauge was better than {+-}10% from 10-6 to 10-10 Torr. The gauge sensitivity of 4 Torr-1 was achieved under 50 {micro}A electron emission in nitrogen. The gauge is expected to find applications in vacuum measurements from 10-7 Torr to below 10-11 Torr.

  3. Widely tunable quantum cascade laser-based terahertz source.

    Science.gov (United States)

    Danylov, Andriy A; Light, Alexander R; Waldman, Jerry; Erickson, Neal; Qian, Xifeng

    2014-07-10

    A compact, tunable, ultranarrowband terahertz source, Δν∼1  MHz, is demonstrated by upconversion of a 2.324 THz, free-running quantum cascade laser with a THz Schottky-diode-balanced mixer using a swept, synthesized microwave source to drive the nonlinearity. Continuously tunable radiation of 1 μW power is demonstrated in two frequency regions: ν(Laser) ± 0 to 50 GHz and ν(Laser) ± 70 to 115 GHz. The sideband spectra were characterized with a Fourier-transform spectrometer, and the radiation was tuned through CO, HDO, and D2O rotational transitions.

  4. Enhancement of the EUV emission of a metallic capillary discharge operated with argon ambient gas

    Energy Technology Data Exchange (ETDEWEB)

    Chan, L. S., E-mail: lschan1982@yahoo.com; Tan, D., E-mail: lschan1982@yahoo.com; Saboohi, S., E-mail: lschan1982@yahoo.com; Yap, S. L., E-mail: lschan1982@yahoo.com; Wong, C. S., E-mail: lschan1982@yahoo.com [Plasma Technology Research Centre, Physics Department, University of Malaya, 50603 Kuala Lumpur (Malaysia)

    2014-03-05

    In this work, the metallic capillary discharge is operated with two different ambients: air and argon. In the experiments reported here, the chamber is first evacuated to 10{sup −5} mbar. The discharge is initiated by the transient hollow cathode effect generated electron beam, with either air ambient or argon ambient at 10{sup −4} mbar. The bombardment of electron beam at the tip of the stainless steel anode gives rise to a metallic vapor, which is injected into the capillary and initiates the main discharge through the capillary. The EUV emission is measured for different discharge voltages for both conditions and compared. It is found that the metallic capillary discharge with argon ambientis able to produce higher EUV energy compared to that with air ambient.

  5. Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists

    KAUST Repository

    Jiang, Jing

    2015-03-19

    Ligand stabilized metal oxide nanoparticle resists are promising candidates for EUV lithography due to their high sensitivity for high-resolution patterning and high etching resistance. As ligand exchange is responsible for the patterning mechanism, we systematically studied the influence of ligand structures of metal oxide EUV nanoparticles on their sensitivity and dissolution behavior. ZrO2 nanoparticles were protected with various aromatic ligands with electron withdrawing and electron donating groups. These nanoparticles have lower sensitivity compared to those with aliphatic ligands suggesting the structures of these ligands is more important than their pka on resist sensitivity. The influence of ligand structure was further studied by comparing the nanoparticles’ solubility for a single type ligand to mixtures of ligands. The mixture of nanoparticles showed improved pattern quality. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

  6. EUV actinic defect inspection and defect printability at the sub-32 nm half pitch

    Energy Technology Data Exchange (ETDEWEB)

    Huh, Sungmin; Kearney, Patrick; Wurm, Stefan; Goodwin, Frank; Han, Hakseung; Goldberg, Kenneth; Mochi, Iacopp; Gullikson, Eric M.

    2009-08-01

    Extreme ultraviolet (EUV) mask blanks with embedded phase defects were inspected with a reticle actinic inspection tool (AIT) and the Lasertec M7360. The Lasertec M7360, operated at SEMA TECH's Mask Blank Development Center (MBDC) in Albany, NY, has a sensitivity to multilayer defects down to 40-45 nm, which is not likely sufficient for mask blank development below the 32 nm half-pitch node. Phase defect printability was simulated to calculate the required defect sensitivity for a next generation blank inspection tool to support reticle development for the sub-32 nm half-pitch technology node. Defect mitigation technology is proposed to take advantage of mask blanks with some defects. This technology will reduce the cost of ownership of EUV mask blanks. This paper will also discuss the kind of infrastructure that will be required for the development and mass production stages.

  7. Undulator based scanning microscope at the National Synchrotron Light Source

    International Nuclear Information System (INIS)

    Rarback, H.; Shu, D.; Ade, H.; Jacobsen, C.; Kirz, J.; McNulty, I.; Rosser, R.

    1986-01-01

    A second generation scanning soft x-ray microscope is under construction, designed to utilize the dramatic increase in source bightness available at the soft x-ray undulator. The new instrument is expected to reduce image acquisition time by a factor of about 100, and to improve resolution, stability, and reproducibility

  8. Quantum-dot-based integrated non-linear sources

    DEFF Research Database (Denmark)

    Bernard, Alice; Mariani, Silvia; Andronico, Alessio

    2015-01-01

    The authors report on the design and the preliminary characterisation of two active non-linear sources in the terahertz and near-infrared range. The former is associated to difference-frequency generation between whispering gallery modes of an AlGaAs microring resonator, whereas the latter...

  9. Single-photon sources based on single molecules in solids

    International Nuclear Information System (INIS)

    Moerner, W E

    2004-01-01

    Single molecules in suitable host crystals have been demonstrated to be useful single-photon emitters both at liquid-helium temperatures and at room temperature. The low-temperature source achieved controllable emission of single photons from a single terrylene molecule in p-terphenyl by an adiabatic rapid passage technique. In contrast with almost all other single-molecule systems, terrylene single molecules show extremely high photostability under continuous, high-intensity irradiation. A room-temperature source utilizing this material has been demonstrated, in which fast pumping into vibrational sidebands of the electronically excited state achieved efficient inversion of the emissive level. This source yielded a single-photon emission probability p(1) of 0.86 at a detected count rate near 300 000 photons s -1 , with very small probability of emission of more than one photon. Thus, single molecules in solids can be considered as contenders for applications of single-photon sources such as quantum key distribution

  10. Synthesis Of Ultrasound Field Sources Based on Phase Screen Approximation

    Directory of Open Access Journals (Sweden)

    Sukhanov Dmitry

    2018-01-01

    Full Text Available Here is proposed the method for synthesizing the sources of an acoustic field on the basis of an approximation of the phase screen. The technology of manufacturing ultrasonic phased arrays providing the formation of a field of a given distribution is proposed. An experimental setup has been developed for the formation of a vortex field at a distance of 10 cm.

  11. Great Problems of Mathematics: A Course Based on Original Sources.

    Science.gov (United States)

    Laubenbacher, Reinhard C.; Pengelley, David J.

    1992-01-01

    Describes the history of five selected problems from mathematics that are included in an undergraduate honors course designed to utilize original sources for demonstrating the evolution of ideas developed in solving these problems: area and the definite integral, the beginnings of set theory, solutions of algebraic equations, Fermat's last…

  12. Market-based support schemes for renewable energy sources

    NARCIS (Netherlands)

    Fagiani, R.

    2014-01-01

    The European Union set ambitious goals regarding the production of electricity from renewable energy sources and the majority of European governments have implemented policies stimulating investments in such technologies. Support schemes differ in many aspects, not only in their effectivity and

  13. Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

    KAUST Repository

    Chakrabarty, Souvik; Ouyang, Christine; Krysak, Marie; Trikeriotis, Markos; Cho, Kyoungyoung; Giannelis, Emmanuel P.; Ober, Christopher K.

    2013-01-01

    DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

  14. X ray and EUV spectroscopic measurements of highly charged tungsten ions relevant to fusion plasmas

    International Nuclear Information System (INIS)

    Radtke, R; Biedermann, C; Mandelbaum, P; Schwob, J L

    2007-01-01

    Using high-resolution x ray and extreme ultraviolet (EUV) spectrometry, the line emission of W 28+ - W 50+ ions was measured at the Berlin Electron Beam Ion Trap (EBIT). Our study encompasses a wide range of wavelengths (5-800 A) and includes the observation of electric and magnetic dipole lines. The results of our measurements are compared with predicted transition wavelengths from ab initioatomic structure calculations

  15. Method for the manufacture of phase shifting masks for EUV lithography

    Science.gov (United States)

    Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.; Barty, Anton

    2006-04-04

    A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.

  16. Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

    KAUST Repository

    Chakrabarty, Souvik

    2013-04-01

    DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

  17. High-NA EUV lithography enabling Moore's law in the next decade

    Science.gov (United States)

    van Schoot, Jan; Troost, Kars; Bornebroek, Frank; van Ballegoij, Rob; Lok, Sjoerd; Krabbendam, Peter; Stoeldraijer, Judon; Loopstra, Erik; Benschop, Jos P.; Finders, Jo; Meiling, Hans; van Setten, Eelco; Kneer, Bernhard; Kuerz, Peter; Kaiser, Winfried; Heil, Tilmann; Migura, Sascha; Neumann, Jens Timo

    2017-10-01

    While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their activities on a EUV exposure tool with Numerical Aperture of 0.55. The purpose of this scanner, targeting an ultimate resolution of 8nm, is to extend Moore's law throughout the next decade. A novel, anamorphic lens design, capable of providing the required Numerical Aperture has been investigated; This lens will be paired with new, faster stages and more accurate sensors enabling Moore's law economical requirements, as well as the tight focus and overlay control needed for future process nodes. The tighter focus and overlay control budgets, as well as the anamorphic optics, will drive innovations in the imaging and OPC modelling. Furthermore, advances in resist and mask technology will be required to image lithography features with less than 10nm resolution. This paper presents an overview of the target specifications, key technology innovations and imaging simulations demonstrating the advantages as compared to 0.33NA and showing the capabilities of the next generation EUV systems.

  18. The future of EUV lithography: enabling Moore's Law in the next decade

    Science.gov (United States)

    Pirati, Alberto; van Schoot, Jan; Troost, Kars; van Ballegoij, Rob; Krabbendam, Peter; Stoeldraijer, Judon; Loopstra, Erik; Benschop, Jos; Finders, Jo; Meiling, Hans; van Setten, Eelco; Mika, Niclas; Dredonx, Jeannot; Stamm, Uwe; Kneer, Bernhard; Thuering, Bernd; Kaiser, Winfried; Heil, Tilmann; Migura, Sascha

    2017-03-01

    While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their development activities on a EUV exposure tool with Numerical Aperture greater than 0.5. The purpose of this scanner, targeting a resolution of 8nm, is to extend Moore's law throughout the next decade. A novel, anamorphic lens design, has been developed to provide the required Numerical Aperture; this lens will be paired with new, faster stages and more accurate sensors enabling Moore's law economical requirements, as well as the tight focus and overlay control needed for future process nodes. The tighter focus and overlay control budgets, as well as the anamorphic optics, will drive innovations in the imaging and OPC modelling, and possibly in the metrology concepts. Furthermore, advances in resist and mask technology will be required to image lithography features with less than 10nm resolution. This paper presents an overview of the key technology innovations and infrastructure requirements for the next generation EUV systems.

  19. EUV emission stimulated by use of dual laser pulses from continus liquid microjet targets

    Science.gov (United States)

    Higashiguchi, Takeshi; Rajyaguru, Chirag; Sasaki, Wataru; Kubodera, Shoichi

    2004-11-01

    A continuous water-jet or water-jet mixed with LiF with several tens μm diameter was formed in a vacuum chamber through a small capillary nozzle. Usage of two laser pulses is an efficient way to produce EUV emission, since a density and temperature of a plasma formed by the first laser pulse are regulated by the second laser pulse. By adjusting the delay of the second pulse, one could maximize the EUV emission. A subpicosecond Ti:Sapphire laser at a wavelength of 800 nm produced a maximum energy around 30 mJ. The beam was divided by a Michelson interferometer, which produced two laser pulses with energies of 5 mJ. The pulse duration was adjusted around 300 fs (FWHM). Both beams were focused on a micro-jet using a lens with a focal length of 15 cm. The delay time between the two pulses was varied from 100 to 800 ps by use of an optical delay line. Clear enhancement of the EUV emission yield was observed when the delay between the two pulses was around 500 ps. The experimentally observed delay agrees reasonably well with that of a plasma to expand to its critical density of 10^21 cm-3.

  20. Efficient analysis of three dimensional EUV mask induced imaging artifacts using the waveguide decomposition method

    Science.gov (United States)

    Shao, Feng; Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas

    2009-10-01

    This paper employs the Waveguide decomposition method as an efficient rigorous electromagnetic field (EMF) solver to investigate three dimensional mask-induced imaging artifacts in EUV lithography. The major mask diffraction induced imaging artifacts are first identified by applying the Zernike analysis of the mask nearfield spectrum of 2D lines/spaces. Three dimensional mask features like 22nm semidense/dense contacts/posts, isolated elbows and line-ends are then investigated in terms of lithographic results. After that, the 3D mask-induced imaging artifacts such as feature orientation dependent best focus shift, process window asymmetries, and other aberration-like phenomena are explored for the studied mask features. The simulation results can help lithographers to understand the reasons of EUV-specific imaging artifacts and to devise illumination and feature dependent strategies for their compensation in the optical proximity correction (OPC) for EUV masks. At last, an efficient approach using the Zernike analysis together with the Waveguide decomposition technique is proposed to characterize the impact of mask properties for the future OPC process.

  1. Iterative procedure for in-situ EUV optical testing with an incoherent source

    Energy Technology Data Exchange (ETDEWEB)

    Miyawaka, Ryan; Naulleau, Patrick; Zakhor, Avideh

    2009-12-01

    We propose an iterative method for in-situ optical testing under partially coherent illumination that relies on the rapid computation of aerial images. In this method a known pattern is imaged with the test optic at several planes through focus. A model is created that iterates through possible aberration maps until the through-focus series of aerial images matches the experimental result. The computation time of calculating the through-focus series is significantly reduced by a-SOCS, an adapted form of the Sum Of Coherent Systems (SOCS) decomposition. In this method, the Hopkins formulation is described by an operator S which maps the space of pupil aberrations to the space of aerial images. This operator is well approximated by a truncated sum of its spectral components.

  2. Model-Based Least Squares Reconstruction of Coded Source Neutron Radiographs: Integrating the ORNL HFIR CG1D Source Model

    Energy Technology Data Exchange (ETDEWEB)

    Santos-Villalobos, Hector J [ORNL; Gregor, Jens [University of Tennessee, Knoxville (UTK); Bingham, Philip R [ORNL

    2014-01-01

    At the present, neutron sources cannot be fabricated small and powerful enough in order to achieve high resolution radiography while maintaining an adequate flux. One solution is to employ computational imaging techniques such as a Magnified Coded Source Imaging (CSI) system. A coded-mask is placed between the neutron source and the object. The system resolution is increased by reducing the size of the mask holes and the flux is increased by increasing the size of the coded-mask and/or the number of holes. One limitation of such system is that the resolution of current state-of-the-art scintillator-based detectors caps around 50um. To overcome this challenge, the coded-mask and object are magnified by making the distance from the coded-mask to the object much smaller than the distance from object to detector. In previous work, we have shown via synthetic experiments that our least squares method outperforms other methods in image quality and reconstruction precision because of the modeling of the CSI system components. However, the validation experiments were limited to simplistic neutron sources. In this work, we aim to model the flux distribution of a real neutron source and incorporate such a model in our least squares computational system. We provide a full description of the methodology used to characterize the neutron source and validate the method with synthetic experiments.

  3. Cost Analysis Sources and Documents Data Base Reference Manual (Update)

    Science.gov (United States)

    1989-06-01

    M: Refcrence Manual PRICE H: Training Course Workbook 11. Use in Cost Analysis. Important source of cost estimates for electronic and mechanical...Nature of Data. Contains many microeconomic time series by month or quarter. 5. Level of Detail. Very detailed. 6. Normalization Processes Required...Reference Manual. Moorestown, N.J,: GE Corporation, September 1986. 64. PRICE Training Course Workbook . Moorestown, N.J.: GE Corporation, February 1986

  4. Control and Driving Methods for LED Based Intelligent Light Sources

    OpenAIRE

    Beczkowski, Szymon

    2012-01-01

    High power light-emitting diodes allow the creation of luminaires capable of generating saturated colour light at very high efficacies. Contrary to traditional light sources like incandescent and high-intensity discharge lamps, where colour is generated using filters, LEDs use additive light mixing, where the intensity of each primary colour diode has to be adjusted to the needed intensity to generate specified colour. The function of LED driver is to supply the diode with power needed to ach...

  5. Pulsed neutron source based on accelerator-subcritical-assembly

    Energy Technology Data Exchange (ETDEWEB)

    Inoue, Makoto; Noda, Akira; Iwashita, Yoshihisa; Okamoto, Hiromi; Shirai, Toshiyuki [Kyoto Univ., Uji (Japan). Inst. for Chemical Research

    1997-03-01

    A new pulsed neutron source which consists of a 300MeV proton linac and a nuclear fuel subcritical assembly is proposed. The proton linac produces pulsed spallation neutrons, which are multipied by the subcritical assembly. A prototype proton linac that accelerates protons up to 7MeV has been developed and a high energy section of a DAW structure is studied with a power model. Halo formations in high intensity beam are also being studied. (author)

  6. Novel EUV resist materials design for 14nm half pitch and below

    Science.gov (United States)

    Tsubaki, Hideaki; Tarutani, Shinji; Fujimori, Toru; Takizawa, Hiroo; Goto, Takahiro

    2014-04-01

    Polymers with a different Tg and activation energy were prepared to clarify influences of acid diffusion on resolution at 15 nm half-pitch (hp) and 14 nm hp using a EUV micro-field exposure tool (MET) at LBNL. Resolution on such a narrow pattern was limited by collapse and pinching. Clear relationship between pinching numbers and polymer Tg indicates that acid diffusion is one of major contributors on the pinching. In addition, polymers with a low thermal activation energy (Ea) on deprotection were effective for reducing pinching. This is probably originated from its high chemically amplification character even in low post-exposure bake (PEB) temperature to obtain both large chemical contrast and short acid diffusion. On the other hand, a good correlation between a cleanable outgassing amount and Ea indicates trade-off relationship between outgassing and resolution. Advantages of n-butyl acetate (nBA) developer have been investigated in viewpoint of dissolution uniformity. Surface roughness of a non-patterned resist film at half-exposed area, which was well correlated with LWR, was measured by AFM as indicator of uniformity in development process. To avoid any differences in resist chemistry other than development process, cross linking negative tone resist was applied for this study. The surface roughness obtained by nBA, which is conventional negative-tone imaging (NTI) developer, was 32 % lower than that obtained by 2.38 % TMAH solution. NTI resist system with a nBA developer and optimized resist reduced LWR from 4.8 nm to 3.0 nm in comparison with conventional positive tone resist with a 2.38 % TMAH developer. In addition, advantage on semi-dense trench patterning was well defined. New EUV sensitizer with 1.15 times higher EUV absorption resulted in 1.15 times higher acid yield by EUV exposure. Lithography performance of the new EUV sensitizer has been investigated by MET at SEMATECH Albany. Sensitivity was indeed improved from 20 mJ/cm2 to 17 mJ/cm2 according

  7. Integrating source-language context into phrase-based statistical machine translation

    NARCIS (Netherlands)

    Haque, R.; Kumar Naskar, S.; Bosch, A.P.J. van den; Way, A.

    2011-01-01

    The translation features typically used in Phrase-Based Statistical Machine Translation (PB-SMT) model dependencies between the source and target phrases, but not among the phrases in the source language themselves. A swathe of research has demonstrated that integrating source context modelling

  8. Overview of receptor-based source apportionment studies for speciated atmospheric mercury

    OpenAIRE

    Cheng, I.; Xu, X.; Zhang, L.

    2015-01-01

    Receptor-based source apportionment studies of speciated atmospheric mercury are not only concerned with source contributions but also with the influence of transport, transformation, and deposition processes on speciated atmospheric mercury concentrations at receptor locations. Previous studies applied multivariate receptor models including principal components analysis and positive matrix factorization, and back trajectory receptor models including potential source contri...

  9. A Method for the Analysis of Information Use in Source-Based Writing

    Science.gov (United States)

    Sormunen, Eero; Heinstrom, Jannica; Romu, Leena; Turunen, Risto

    2012-01-01

    Introduction: Past research on source-based writing assignments has hesitated to scrutinize how students actually use information afforded by sources. This paper introduces a method for the analysis of text transformations from sources to texts composed. The method is aimed to serve scholars in building a more detailed understanding of how…

  10. The hypertext information system on pulsed neutron sources and scientific investigations based on these sources

    Energy Technology Data Exchange (ETDEWEB)

    Litvinenko, E I; Astakhov, Yu A [Frank Laboratory of Neutron Physics, Joint Institute for Nuclear Research, Dubna (Russian Federation); Akishina, E P [Moscow State Engineering Physics Institute (Technical University), Moscow (Russian Federation); Semenov, R N; Smol` kov, I S [International University ` Dubna` , Dubna (Russian Federation)

    1998-10-01

    The work on the creation of the hypertext information system has been performed on the basis of the web-server of the Frank Laboratory of Neutron Physics, JINR. The initial project proposed the creation of HTML information resources and did not consider the usage of any database for the information management. During the project implementation it became obvious that the system should have well defined structured informational model and it might be helpful to imply the relational database as a part of the system. The ORACLE server at the Laboratory of Computing Techniques and Automation (LCTA) of the JINR has been used for this task. Now we have a set of ORACLE tables designed using CASE tools for the informational model of the system, structured information about neutron sources, neutron instruments, printed publications and URL addresses. We have also the web interface to these tables using free ware gateway ORALINK installed on our Pentium PC with Windows NT and some tools to administer database and view pictures stored in the tables. We took into account NeXuS specifications while tried to design the informational model of the system, and we continue to work on its creation 15 refs., 2 figs., 1 tab. Submitted to the Proceedings of the International Workshop on New Opportunities for Better User Group Software (NOBUGS`97), 10-12 Dec 1997, USA

  11. The hypertext information system on pulsed neutron sources and scientific investigations based on these sources

    International Nuclear Information System (INIS)

    Litvinenko, E.I; Astakhov, Yu.A.; Akishina, E.P.; Semenov, R.N.; Smol'kov, I.S.

    1998-01-01

    The work on the creation of the hypertext information system has been performed on the basis of the web-server of the Frank Laboratory of Neutron Physics, JINR. The initial project proposed the creation of HTML information resources and did not consider the usage of any database for the information management. During the project implementation it became obvious that the system should have well defined structured informational model and it might be helpful to imply the relational database as a part of the system. The ORACLE server at the Laboratory of Computing Techniques and Automation (LCTA) of the JINR has been used for this task. Now we have a set of ORACLE tables designed using CASE tools for the informational model of the system, structured information about neutron sources, neutron instruments, printed publications and URL addresses. We have also the web interface to these tables using free ware gateway ORALINK installed on our Pentium PC with Windows NT and some tools to administer database and view pictures stored in the tables. We took into account NeXuS specifications while tried to design the informational model of the system, and we continue to work on its creation

  12. Heavy Ion Injection Into Synchrotrons, Based On Electron String Ion Sources

    CERN Document Server

    Donets, E E; Syresin, E M

    2004-01-01

    A possibility of heavy ions injection into synchrotrons is discussed on the base of two novel ion sources, which are under development JINR during last decade: 1) the electron string ion source (ESIS), which is a modified version of a conventional electron beam ion source (EBIS), working in a reflex mode of operation, and 2) the tubular electron string ion source (TESIS). The Electron String Ion Source "Krion-2" (VBLHE, JINR, Dubna) with an applied confining magnetic field of 3 T was used for injection into the superconducting JINR synchrotron - Nuclotron and during this runs the source provided a high pulse intensity of the highly charged ion beams: Ar16+

  13. Polymer and small molecule based hybrid light source

    Science.gov (United States)

    Choong, Vi-En; Choulis, Stelios; Krummacher, Benjamin Claus; Mathai, Mathew; So, Franky

    2010-03-16

    An organic electroluminescent device, includes: a substrate; a hole-injecting electrode (anode) coated over the substrate; a hole injection layer coated over the anode; a hole transporting layer coated over the hole injection layer; a polymer based light emitting layer, coated over the hole transporting layer; a small molecule based light emitting layer, thermally evaporated over the polymer based light emitting layer; and an electron-injecting electrode (cathode) deposited over the electroluminescent polymer layer.

  14. Performance of positive ion based high power ion source of EAST neutral beam injector

    International Nuclear Information System (INIS)

    Hu, Chundong; Xie, Yahong; Xie, Yuanlai; Liu, Sheng; Xu, Yongjian; Liang, Lizhen; Jiang, Caichao; Li, Jun; Liu, Zhimin

    2016-01-01

    The positive ion based source with a hot cathode based arc chamber and a tetrode accelerator was employed for a neutral beam injector on the experimental advanced superconducting tokamak (EAST). Four ion sources were developed and each ion source has produced 4 MW @ 80 keV hydrogen beam on the test bed. 100 s long pulse operation with modulated beam has also been tested on the test bed. The accelerator was upgraded from circular shaped to diamond shaped in the latest two ion sources. In the latest campaign of EAST experiment, four ion sources injected more than 4 MW deuterium beam with beam energy of 60 keV into EAST

  15. Validation of Earth atmosphere models using solar EUV observations from the CORONAS and PROBA2 satellites in occultation mode

    Science.gov (United States)

    Slemzin, Vladimir; Ulyanov, Artyom; Gaikovich, Konstantin; Kuzin, Sergey; Pertsov, Andrey; Berghmans, David; Dominique, Marie

    2016-02-01

    Aims: Knowledge of properties of the Earth's upper atmosphere is important for predicting the lifetime of low-orbit spacecraft as well as for planning operation of space instruments whose data may be distorted by atmospheric effects. The accuracy of the models commonly used for simulating the structure of the atmosphere is limited by the scarcity of the observations they are based on, so improvement of these models requires validation under different atmospheric conditions. Measurements of the absorption of the solar extreme ultraviolet (EUV) radiation in the upper atmosphere below 500 km by instruments operating on low-Earth orbits (LEO) satellites provide efficient means for such validation as well as for continuous monitoring of the upper atmosphere and for studying its response to the solar and geomagnetic activity. Method: This paper presents results of measurements of the solar EUV radiation in the 17 nm wavelength band made with the SPIRIT and TESIS telescopes on board the CORONAS satellites and the SWAP telescope on board the PROBA2 satellite in the occulted parts of the satellite orbits. The transmittance profiles of the atmosphere at altitudes between 150 and 500 km were derived from different phases of solar activity during solar cycles 23 and 24 in the quiet state of the magnetosphere and during the development of a geomagnetic storm. We developed a mathematical procedure based on the Tikhonov regularization method for solution of ill-posed problems in order to retrieve extinction coefficients from the transmittance profiles. The transmittance profiles derived from the data and the retrieved extinction coefficients are compared with simulations carried out with the NRLMSISE-00 atmosphere model maintained by Naval Research Laboratory (USA) and the DTM-2013 model developed at CNES in the framework of the FP7 project ATMOP. Results: Under quiet and slightly disturbed magnetospheric conditions during high and low solar activity the extinction coefficients

  16. EUV lines observed with EIS/Hinode in a solar prominence

    Science.gov (United States)

    Labrosse, N.; Schmieder, B.; Heinzel, P.; Watanabe, T.

    2011-07-01

    Context. During a multi-wavelength observation campaign with Hinode and ground-based instruments, a solar prominence was observed for three consecutive days as it crossed the western limb of the Sun in April 2007. Aims: We report on observations obtained on 26 April 2007 using EIS (Extreme ultraviolet Imaging Spectrometer) on Hinode. They are analysed to provide a qualitative diagnostic of the plasma in different parts of the prominence. Methods: After correcting for instrumental effects, the rasters at different wavelengths are presented. Several regions within the same prominence are identified for further analysis. Selected profiles for lines with formation temperatures between log (T) = 4.7 and log (T) = 6.3, as well as their integrated intensities, are given. The profiles of coronal, transition region, and He ii lines are discussed. We pay special attention to the He ii line, which is blended with coronal lines. Results: Some quantitative results are obtained by analysing the line profiles. They confirm that depression in EUV lines can be interpreted in terms of two mechanisms: absorption of coronal radiation by the hydrogen and neutral helium resonance continua, and emissivity blocking. We present estimates of the He ii line integrated intensity in different parts of the prominence according to different scenarios for the relative contribution of absorption and emissivity blocking to the coronal lines blended with the He ii line. We estimate the contribution of the He ii 256.32 Å line to the He ii raster image to vary between ~44% and 70% of the raster's total intensity in the prominence according to the different models used to take into account the blending coronal lines. The inferred integrated intensities of the He ii 256 Å line are consistent with the theoretical intensities obtained with previous 1D non-LTE radiative transfer calculations, yielding a preliminary estimate of the central temperature of 8700 K, a central pressure of 0.33 dyn cm-2, and a

  17. FEASIBILITY STUDY II OF A MUON BASED NEUTRINO SOURCE.

    Energy Technology Data Exchange (ETDEWEB)

    GALLARDO,J.C.; OZAKI,S.; PALMER,R.B.; ZISMAN,M.

    2001-06-30

    The concept of using a muon storage ring to provide a well characterized beam of muon and electron neutrinos (a Neutrino Factory) has been under study for a number of years now at various laboratories throughout the world. The physics program of a Neutrino Factoryis focused on the relatively unexplored neutrino sector. In conjunction with a detector located a suitable distance from the neutrino source, the facility would make valuable contributions to the study of neutrino masses and lepton mixing. A Neutrino Factory is expected to improve the measurement accuracy of sin{sup 2}(2{theta}{sub 23}) and {Delta}m{sup 2}{sub 32} and provide measurements of sin{sup 2}(2{theta}{sub 13}) and the sign of {Delta}m{sup 2}{sub 32}. It may also be able to measure CP violation in the lepton sector.

  18. A New Spin on Teaching Vocabulary: A Source-Based Approach.

    Science.gov (United States)

    Nilsen, Alleen Pace; Nilsen, Don L. F.

    2003-01-01

    Suggests that teachers should try to use a source-based approach to teaching vocabulary. Explains that a source-based approach starts with basic concepts of human languages and then works with lexical and metaphorical extensions of these basic words. Notes that the purpose of this approach is to find groups of words that can be taught as webs and…

  19. Aging of plumes from emission sources based on chamber simulation

    Science.gov (United States)

    Wang, X.; Deng, W.; Fang, Z.; Bernard, F.; Zhang, Y.; Yu, J.; Mellouki, A.; George, C.

    2017-12-01

    Study on atmospheric aging of plumes from emission sources is essential to understand their contribution to both secondary and primary pollutants occurring in the ambient air. Here we directly introduced vehicle exhaust, biomass burning plume, industrial solvents and cooking plumes into a smog chamber with 30 m3 fluorinated ethylene propylene (FEP) Teflon film reactor housed in a temperature-controlled enclosure, for characterizing primarily emitted air pollutants and for investigating secondarily formed products during photo-oxidation. Moreover, we also initiated study on the formation of secondary aerosols when gasoline vehicle exhaust is mixed with typical coal combustion pollutant SO2 or typical agricultural-related pollutant NH3. Formation of secondary organic aerosols (SOA) from typical solvent toluene was also investigated in ambient air matrix in comparison with purified air matrix. Main findings include: 1) Except for exhaust from idling gasoline vehicles, traditional precursor volatile organic compounds could only explain a very small fraction of SOA formed from vehicle exhaust, biomass burning or cooking plumes, suggesting knowledge gap in SOA precursors; 2) There is the need to re-think vehicle emission standards with a combined primary and/or secondary contribution of vehicle exhaust to PM2.5 or other secondary pollutants such as ozone; 3) When mixed with SO2, the gasoline vehicle exhaust revealed an increase of SOA production factor by 60-200% and meanwhile SO2 oxidation rates increased about a factor of 2.7; when the aged gasoline vehicle exhaust were mixing with NH3, both particle number and mass concentrations were increasing explosively. These phenomenons implied the complex interaction during aging of co-existing source emissions. 4) For typical combination of "tolune+SO2+NOx", when compared to chamber simulation with purified air as matrix, both SOA formation and SO2 oxidation were greatly enhanced under ambient air matrix, and the enhancement

  20. Solar Cycle Variation of Microwave Polar Brightening and EUV Coronal Hole Observed by Nobeyama Radioheliograph and SDO/AIA

    Science.gov (United States)

    Kim, Sujin; Park, Jong-Yeop; Kim, Yeon-Han

    2017-08-01

    We investigate the solar cycle variation of microwave and extreme ultraviolet (EUV) intensity in latitude to compare microwave polar brightening (MPB) with the EUV polar coronal hole (CH). For this study, we used the full-sun images observed in 17 GHz of the Nobeyama Radioheliograph from 1992 July to 2016 November and in two EUV channels of the Atmospheric Imaging Assembly (AIA) 193 Å and 171 Å on the Solar Dynamics Observatory (SDO) from 2011 January to 2016 November. As a result, we found that the polar intensity in EUV is anti-correlated with the polar intensity in microwave. Since the depression of EUV intensity in the pole is mostly owing to the CH appearance and continuation there, the anti-correlation in the intensity implies the intimate association between the polar CH and the MPB. Considering the report of tet{gopal99} that the enhanced microwave brightness in the CH is seen above the enhanced photospheric magnetic field, we suggest that the pole area during the solar minimum has a stronger magnetic field than the quiet sun level and such a strong field in the pole results in the formation of the polar CH. The emission mechanism of the MPB and the physical link with the polar CH are not still fully understood. It is necessary to investigate the MPB using high resolution microwave imaging data, which can be obtained by the high performance large-array radio observatories such as the ALMA project.

  1. Reassessment of the technical bases for estimating source terms. Final report

    International Nuclear Information System (INIS)

    Silberberg, M.; Mitchell, J.A.; Meyer, R.O.; Ryder, C.P.

    1986-07-01

    This document describes a major advance in the technology for calculating source terms from postulated accidents at US light-water reactors. The improved technology consists of (1) an extensive data base from severe accident research programs initiated following the TMI accident, (2) a set of coupled and integrated computer codes (the Source Term Code Package), which models key aspects of fission product behavior under severe accident conditions, and (3) a number of detailed mechanistic codes that bridge the gap between the data base and the Source Term Code Package. The improved understanding of severe accident phenonmena has also allowed an identification of significant sources of uncertainty, which should be considered in estimating source terms. These sources of uncertainty are also described in this document. The current technology provides a significant improvement in evaluating source terms over that available at the time of the Reactor Safety Study (WASH-1400) and, because of this significance, the Nuclear Regulatory Commission staff is recommending its use

  2. A GIS-based time-dependent seismic source modeling of Northern Iran

    Science.gov (United States)

    Hashemi, Mahdi; Alesheikh, Ali Asghar; Zolfaghari, Mohammad Reza

    2017-01-01

    The first step in any seismic hazard study is the definition of seismogenic sources and the estimation of magnitude-frequency relationships for each source. There is as yet no standard methodology for source modeling and many researchers have worked on this topic. This study is an effort to define linear and area seismic sources for Northern Iran. The linear or fault sources are developed based on tectonic features and characteristic earthquakes while the area sources are developed based on spatial distribution of small to moderate earthquakes. Time-dependent recurrence relationships are developed for fault sources using renewal approach while time-independent frequency-magnitude relationships are proposed for area sources based on Poisson process. GIS functionalities are used in this study to introduce and incorporate spatial-temporal and geostatistical indices in delineating area seismic sources. The proposed methodology is used to model seismic sources for an area of about 500 by 400 square kilometers around Tehran. Previous researches and reports are studied to compile an earthquake/fault catalog that is as complete as possible. All events are transformed to uniform magnitude scale; duplicate events and dependent shocks are removed. Completeness and time distribution of the compiled catalog is taken into account. The proposed area and linear seismic sources in conjunction with defined recurrence relationships can be used to develop time-dependent probabilistic seismic hazard analysis of Northern Iran.

  3. Adaptive Source Localization Based Station Keeping of Autonomous Vehicles

    KAUST Repository

    Guler, Samet; Fidan, Baris; Dasgupta, Soura; Anderson, Brian D.O.; Shames, Iman

    2016-01-01

    We study the problem of driving a mobile sensory agent to a target whose location is specied only in terms of the distances to a set of sensor stations or beacons. The beacon positions are unknown, but the agent can continuously measure its distances to them as well as its own position. This problem has two particular applications: (1) capturing a target signal source whose distances to the beacons are measured by these beacons and broadcasted to a surveillance agent, (2) merging a single agent to an autonomous multi-agent system so that the new agent is positioned at desired distances from the existing agents. The problem is solved using an adaptive control framework integrating a parameter estimator producing beacon location estimates, and an adaptive motion control law fed by these estimates to steer the agent toward the target. For location estimation, a least-squares adaptive law is used. The motion control law aims to minimize a convex cost function with unique minimizer at the target location, and is further augmented for persistence of excitation. Stability and convergence analysis is provided, as well as simulation results demonstrating performance and transient behavior.

  4. Adaptive Source Localization Based Station Keeping of Autonomous Vehicles

    KAUST Repository

    Guler, Samet

    2016-10-26

    We study the problem of driving a mobile sensory agent to a target whose location is specied only in terms of the distances to a set of sensor stations or beacons. The beacon positions are unknown, but the agent can continuously measure its distances to them as well as its own position. This problem has two particular applications: (1) capturing a target signal source whose distances to the beacons are measured by these beacons and broadcasted to a surveillance agent, (2) merging a single agent to an autonomous multi-agent system so that the new agent is positioned at desired distances from the existing agents. The problem is solved using an adaptive control framework integrating a parameter estimator producing beacon location estimates, and an adaptive motion control law fed by these estimates to steer the agent toward the target. For location estimation, a least-squares adaptive law is used. The motion control law aims to minimize a convex cost function with unique minimizer at the target location, and is further augmented for persistence of excitation. Stability and convergence analysis is provided, as well as simulation results demonstrating performance and transient behavior.

  5. Liquid Li based neutron source for BNCT and science application.

    Science.gov (United States)

    Horiike, H; Murata, I; Iida, T; Yoshihashi, S; Hoashi, E; Kato, I; Hashimoto, N; Kuri, S; Oshiro, S

    2015-12-01

    Liquid lithium (Li) is a candidate material for a target of intense neutron source, heat transfer medium in space engines and charges stripper. For a medical application of BNCT, epithermal neutrons with least energetic neutrons and γ-ray are required so as to avoid unnecessary doses to a patient. This is enabled by lithium target irradiated by protons at 2.5 MeV range, with utilizing the threshold reaction of (7)Li(p,n)(7)Be at 1.88 MeV. In the system, protons at 2.5 MeV penetrate into Li layer by 0.25 mm with dissipating heat load near the surface. To handle it, thin film flow of high velocity is important for stable operation. For the proton accelerator, electrostatic type of the Schnkel or the tandem is planned to be employed. Neutrons generated at 0.6 MeV are gently moderated to epithermal energy while suppressing accompanying γ-ray minimum by the dedicated moderator assembly. Copyright © 2015 Elsevier Ltd. All rights reserved.

  6. Silicon nanowire based high brightness, pulsed relativistic electron source

    Directory of Open Access Journals (Sweden)

    Deep Sarkar

    2017-06-01

    Full Text Available We demonstrate that silicon nanowire arrays efficiently emit relativistic electron pulses under irradiation by a high-intensity, femtosecond, and near-infrared laser (∼1018 W/cm2, 25 fs, 800 nm. The nanowire array yields fluxes and charge per bunch that are 40 times higher than those emitted by an optically flat surface, in the energy range of 0.2–0.5 MeV. The flux and charge yields for the nanowires are observed to be directional in nature unlike that for planar silicon. Particle-in-cell simulations establish that such large emission is caused by the enhancement of the local electric fields around a nanowire, which consequently leads to an enhanced absorption of laser energy. We show that the high-intensity contrast (ratio of picosecond pedestal to femtosecond peak of the laser pulse (10−9 is crucial to this large yield. We extend the notion of surface local-field enhancement, normally invoked in low-order nonlinear optical processes like second harmonic generation, optical limiting, etc., to ultrahigh laser intensities. These electron pulses, expectedly femtosecond in duration, have potential application in imaging, material modification, ultrafast dynamics, terahertz generation, and fast ion sources.

  7. Alternative current source based Schottky contact with additional electric field

    Science.gov (United States)

    Mamedov, R. K.; Aslanova, A. R.

    2017-07-01

    Additional electric field (AEF) in the Schottky contacts (SC) that covered the peripheral contact region wide and the complete contact region narrow (as TMBS diode) SC. Under the influence of AEF is a redistribution of free electrons produced at certain temperatures of the semiconductor, and is formed the space charge region (SCR). As a result of the superposition of the electric fields SCR and AEF occurs the resulting electric field (REF). The REF is distributed along a straight line perpendicular to the contact surface, so that its intensity (and potential) has a minimum value on the metal surface and the maximum value at a great distance from the metal surface deep into the SCR. Under the influence of AEF as a sided force the metal becomes negative pole and semiconductor - positive pole, therefore, SC with AEF becomes an alternative current source (ACS). The Ni-nSi SC with different diameters (20-1000 μm) under the influence of the AEF as sided force have become ACS with electromotive force in the order of 0.1-1.0 mV, which are generated the electric current in the range of 10-9-10-7 A, flowing through the external resistance 1000 Ohm.

  8. Tomographs based on non-conventional radiation sources and methods

    International Nuclear Information System (INIS)

    Barbuzza, R.; Fresno, M. del; Venere, Marcelo J.; Clausse, Alejandro; Moreno, C.

    2000-01-01

    Computer techniques for tomographic reconstruction of objects X-rayed with a compact plasma focus (PF) are presented. The implemented reconstruction algorithms are based on stochastic searching of solutions of Radon equation, using Genetic Algorithms and Monte Carlo methods. Numerical experiments using actual projections were performed concluding the feasibility of the application of both methods in tomographic reconstruction problem. (author)

  9. Sources, Developments and Directions of Task-Based Language Teaching

    Science.gov (United States)

    Bygate, Martin

    2016-01-01

    This paper provides an outline of the origins, the current shape and the potential directions of task-based language teaching (TBLT) as an approach to language pedagogy. It first offers a brief description of TBLT and considers its origins within language teaching methodology and second language acquisition. It then summarises the current position…

  10. Observations of EUV and X-ray Emission from Comets

    Science.gov (United States)

    Lisse, C.

    The unexpected discovery of x-ray emission from Comet Hyakutake in March 1996 (Lisse et al. 1996) produced a number of questions about the physical mechanism producing the radiation. The original detection and subsequent observations have shown that the very soft (best fit thermal bremsstrahlung model kT0.2 keV) emission is due to an interaction between the solar wind and the comet's atmosphere. Using the results from the more than 15 comets detected to date in x-rays, I report here on the latest results on cometary x-ray emission, including new results from Chandra, and show that charge exchange between highly ionized minor ions in the solar wind and neutral gases in the cometary coma is the most likely operative mechanism. I then use this result to study a number of problems of astrophysical interest: the nature of the cometary coma, other possible sources of x-ray emission in the solar system, the structure of the solar wind in the heliosphere, and the source of the local x-ray background.

  11. Goal based mesh adaptivity for fixed source radiation transport calculations

    International Nuclear Information System (INIS)

    Baker, C.M.J.; Buchan, A.G.; Pain, C.C.; Tollit, B.S.; Goffin, M.A.; Merton, S.R.; Warner, P.

    2013-01-01

    Highlights: ► Derives an anisotropic goal based error measure for shielding problems. ► Reduces the error in the detector response by optimizing the finite element mesh. ► Anisotropic adaptivity captures material interfaces using fewer elements than AMR. ► A new residual based on the numerical scheme chosen forms the error measure. ► The error measure also combines the forward and adjoint metrics in a novel way. - Abstract: In this paper, the application of goal based error measures for anisotropic adaptivity applied to shielding problems in which a detector is present is explored. Goal based adaptivity is important when the response of a detector is required to ensure that dose limits are adhered to. To achieve this, a dual (adjoint) problem is solved which solves the neutron transport equation in terms of the response variables, in this case the detector response. The methods presented can be applied to general finite element solvers, however, the derivation of the residuals are dependent on the underlying finite element scheme which is also discussed in this paper. Once error metrics for the forward and adjoint solutions have been formed they are combined using a novel approach. The two metrics are combined by forming the minimum ellipsoid that covers both the error metrics rather than taking the maximum ellipsoid that is contained within the metrics. Another novel approach used within this paper is the construction of the residual. The residual, used to form the goal based error metrics, is calculated from the subgrid scale correction which is inherent in the underlying spatial discretisation employed

  12. Angra II pipelines and supports data base sources (GPT)

    International Nuclear Information System (INIS)

    Abud, Paulo Roberto; Grand Court, Eduardo Souza de

    1995-01-01

    The analysis of the needs related to the management of assembly of pipelines and support system in a nuclear power plant presents a great deal of data. Such situation leaded to the development of a data base named Erection Management System, EMS, which enables not only the assembly of the equipment, but also the management of the project in addition to monitoring all the activities related to assembly. This work discusses the above mentioned issues

  13. Sources of spontaneous emission based on indium arsenide

    International Nuclear Information System (INIS)

    Zotova, N. V.; Il'inskaya, N. D.; Karandashev, S. A.; Matveev, B. A.; Remennyi, M. A.; Stus', N. M.

    2008-01-01

    The results obtained for light-emitting diodes based on heterostructures that contain InAs in the active region and are grown by the methods of liquid-phase, molecular-beam, and vapor-phase epitaxy from organometallic compounds are reviewed. The emission intensity, the near-field patterns, and the light-current and current-voltage characteristics of light-emitting diodes that have flip-chip structure or feature a point contact are analyzed.

  14. Sources of spontaneous emission based on indium arsenide

    Energy Technology Data Exchange (ETDEWEB)

    Zotova, N V; Il' inskaya, N D; Karandashev, S A; Matveev, B. A., E-mail: bmat@iropt3.ioffe.rssi.ru; Remennyi, M A; Stus' , N M [Russian Academy of Sciences, Ioffe Physicotechnical Institute (Russian Federation)

    2008-06-15

    The results obtained for light-emitting diodes based on heterostructures that contain InAs in the active region and are grown by the methods of liquid-phase, molecular-beam, and vapor-phase epitaxy from organometallic compounds are reviewed. The emission intensity, the near-field patterns, and the light-current and current-voltage characteristics of light-emitting diodes that have flip-chip structure or feature a point contact are analyzed.

  15. Physics and technology development of multilayer EUV reflective optics

    NARCIS (Netherlands)

    Louis, Eric

    2012-01-01

    This thesis describes the development of molybdenum/silicon based multilayer reflective elements for the Extreme UV wavelength range, as motivated by their application in photolithography for semiconductor manufacturing. The thesis reflects the basic thin film physics, technological developments,

  16. Preliminary design of GDT-based 14 MeV neutron source

    International Nuclear Information System (INIS)

    Du Hongfei; Chen Dehong; Wang Hui; Wang Fuqiong; Jiang Jieqiong; Wu Yican; Chen Yiping

    2012-01-01

    To meet the need of D-T fusion neutron source for fusion material testing, design goals were presented in this paper according to the international requirements of neutron source for fusion material testing. A preliminary design scheme of GDT-based 14 MeV neutron source was proposed, and a physics model of the neutron source was built based on progress of GDT experiments. Two preliminary design schemes (i. e. FDS-GDT1, FDS-GDT2) were designed; among which FDS-GDT2 can be used for fusion material testing with neutron first wall loading of 2 MW/m 2 . (authors)

  17. Optimisation of the neutron source based on gas dynamic trap for transmutation of radioactive wastes

    Science.gov (United States)

    Anikeev, Andrey V.

    2012-06-01

    The Budker Institute of Nuclear Physics in collaboration with the Russian and foreign organizations develop the project of 14 MeV neutron source, which can be used for fusion material studies and for other application. The projected neutron source of plasma type is based on the plasma Gas Dynamic Trap (GDT), which is a special magnetic mirror system for plasma confinement. Presented work continues the subject of development the GDT-based neutron source (GDT-NS) for hybrid fusion-fission reactors. The paper presents the results of recent numerical optimization of such neutron source for transmutation of the long-lives radioactive wastes in spent nuclear fuel.

  18. Combustion-based power source for Venus surface missions

    Science.gov (United States)

    Miller, Timothy F.; Paul, Michael V.; Oleson, Steven R.

    2016-10-01

    The National Research Council has identified in situ exploration of Venus as an important mission for the coming decade of NASA's exploration of our solar system (Squyers, 2013 [1]). Heavy cloud cover makes the use of solar photovoltaics extremely problematic for power generation for Venus surface missions. In this paper, we propose a class of planetary exploration missions (for use on Venus and elsewhere) in solar-deprived situations where photovoltaics cannot be used, batteries do not provide sufficient specific energy and mission duration, and nuclear systems may be too costly or complex to justify or simply unavailable. Metal-fueled, combustion-based powerplants have been demonstrated for application in the terrestrial undersea environment. Modified or extended versions of the undersea-based systems may be appropriate for these sunless missions. We describe systems carrying lithium fuel and sulfur-hexafluoride oxidizer that have the potential for many days of operation in the sunless craters of the moon. On Venus a system level specific energy of 240 to 370 We-hr/kg should be possible if the oxidizer is brought from earth. By using either lithium or a magnesium-based alloy fuel, it may be possible to operate a similar system with CO2 derived directly from the Venus atmosphere, thus providing an estimated system specific energy of 1100 We+PV-hr/kg (the subscript refers to both electrical and mechanical power), thereby providing mission durations that enable useful scientific investigation. The results of an analysis performed by the NASA Glenn COMPASS team describe a mission operating at 2.3 kWe+PV for 5 days (120 h), with less than 260 kg power/energy system mass total. This lander would be of a size and cost suitable for a New Frontiers class of mission.

  19. A compact X-ray source based on Compton scattering

    Energy Technology Data Exchange (ETDEWEB)

    Bulyak, E.; Gladkikh, P.; Grigor' ev, Yu.; Guk, I.; Karnaukhov, I.; Khodyachikh, A.; Kononenko, S.; Mocheshnikov, N.; Mytsykov, A.; Shcherbakov, A. E-mail: shcherbakov@kipt.kharkov.ua; Tarasenko, A.; Telegin, Yu.; Zelinsky, A

    2001-07-21

    The main parameters of Kharkov electron storage ring N-100 with a beam energy range from 70 to 150 MeV are presented. The main results that were obtained in experimental researches are briefly described. The future of the N-100 upgrade to the development of the X-ray generator based on Compton back-scattering are presented. The electron beam energy range will be extended up to 250 MeV and the circumference of the storage ring will be 13.72 m. The lattice, parameters of the electron beam and the Compton back-scattering photons flux are described.

  20. A compact X-ray source based on Compton scattering

    International Nuclear Information System (INIS)

    Bulyak, E.; Gladkikh, P.; Grigor'ev, Yu.; Guk, I.; Karnaukhov, I.; Khodyachikh, A.; Kononenko, S.; Mocheshnikov, N.; Mytsykov, A.; Shcherbakov, A.; Tarasenko, A.; Telegin, Yu.; Zelinsky, A.

    2001-01-01

    The main parameters of Kharkov electron storage ring N-100 with a beam energy range from 70 to 150 MeV are presented. The main results that were obtained in experimental researches are briefly described. The future of the N-100 upgrade to the development of the X-ray generator based on Compton back-scattering are presented. The electron beam energy range will be extended up to 250 MeV and the circumference of the storage ring will be 13.72 m. The lattice, parameters of the electron beam and the Compton back-scattering photons flux are described

  1. Fiber MOPA based tunable source for terahertz spectroscopy

    International Nuclear Information System (INIS)

    Malinowski, A; Lin, D; Alam, S U; Zhang, Z; Ibsen, M; Richardson, D J; Young, J; Wright, P; Ozanyan, K; Stringer, M; Miles, R E

    2012-01-01

    We have developed a terahertz spectrometer based on difference frequency generation of beams from an ytterbium fiber master oscillator power amplifier (MOPA) system. The spectrometer has a resolution of ∼ 2 GHz. It can be tuned rapidly over several hundred GHz, and a wider frequency range can be covered (0.7–2.5 THz demonstrated) by swapping in alternate seed lasers and adjusting the alignment of the beams into the difference frequency generation (DFG) crystal. The system was constructed entirely from commercially available fiber and fiber components. We present some demonstration data on water vapor absorption lines

  2. Spatiotemporal Analysis of Coronal Loops Using Seismology of Damped Kink Oscillations and Forward Modeling of EUV Intensity Profiles

    Science.gov (United States)

    Pascoe, D. J.; Anfinogentov, S. A.; Goddard, C. R.; Nakariakov, V. M.

    2018-06-01

    The shape of the damping profile of kink oscillations in coronal loops has recently allowed the transverse density profile of the loop to be estimated. This requires accurate measurement of the damping profile that can distinguish the Gaussian and exponential damping regimes, otherwise there are more unknowns than observables. Forward modeling of the transverse intensity profile may also be used to estimate the width of the inhomogeneous layer of a loop, providing an independent estimate of one of these unknowns. We analyze an oscillating loop for which the seismological determination of the transverse structure is inconclusive except when supplemented by additional spatial information from the transverse intensity profile. Our temporal analysis describes the motion of a coronal loop as a kink oscillation damped by resonant absorption, and our spatial analysis is based on forward modeling the transverse EUV intensity profile of the loop under the isothermal and optically thin approximations. We use Bayesian analysis and Markov chain Monte Carlo sampling to apply our spatial and temporal models both individually and simultaneously to our data and compare the results with numerical simulations. Combining the two methods allows both the inhomogeneous layer width and density contrast to be calculated, which is not possible for the same data when each method is applied individually. We demonstrate that the assumption of an exponential damping profile leads to a significantly larger error in the inferred density contrast ratio compared with a Gaussian damping profile.

  3. Small Area Model-Based Estimators Using Big Data Sources

    Directory of Open Access Journals (Sweden)

    Marchetti Stefano

    2015-06-01

    Full Text Available The timely, accurate monitoring of social indicators, such as poverty or inequality, on a finegrained spatial and temporal scale is a crucial tool for understanding social phenomena and policymaking, but poses a great challenge to official statistics. This article argues that an interdisciplinary approach, combining the body of statistical research in small area estimation with the body of research in social data mining based on Big Data, can provide novel means to tackle this problem successfully. Big Data derived from the digital crumbs that humans leave behind in their daily activities are in fact providing ever more accurate proxies of social life. Social data mining from these data, coupled with advanced model-based techniques for fine-grained estimates, have the potential to provide a novel microscope through which to view and understand social complexity. This article suggests three ways to use Big Data together with small area estimation techniques, and shows how Big Data has the potential to mirror aspects of well-being and other socioeconomic phenomena.

  4. Atomic structure calculations and identification of EUV and SXR spectral lines in Sr XXX

    International Nuclear Information System (INIS)

    Goyal, Arun; Khatri, Indu; Aggarwal, Sunny; Singh, A.K.; Mohan, Man

    2015-01-01

    We report an extensive theoretical study of atomic data for Sr XXX in a wide range with L-shell electron excitations to the M-shell. We have calculated energy levels, wave-function compositions and lifetimes for lowest 113 fine structure levels and wavelengths of an extreme Ultraviolet (EUV) and soft X-ray (SXR) transitions. We have employed multi-configuration Dirac Fock method (MCDF) approach within the framework of Dirac–Coulomb Hamiltonian including quantum electrodynamics (QED) and Breit corrections. We have also presented the radiative data for electric and magnetic dipole (E1, M1) and quadrupole (E2, M2) transitions from the ground state. We have made comparisons with available energy levels compiled by NIST and achieve good agreement. But due to inadequate data in the literature, analogous relativistic distorted wave calculations have also been performed using flexible atomic code (FAC) to assess the reliability and accuracy of our results. Additionally, we have provided new atomic data for Sr XXX which is not published elsewhere in the literature and we believe that our results may be beneficial in fusion plasma research and astrophysical investigations and applications. - Highlights: • 113 Lowest levels for Sr XXX are calculated. • Extreme Ultraviolet (EUV) and soft-X ray (SXR) spectral lines are identified. • Wavelengths of EUV and SXR spectral lines are reported. • E1, E2, M1 and M2 transition rates, oscillator strengths and lines strengths for lowest 113 levels are presented. • Lifetimes for lowest 113 fine structure levels are provided

  5. The comparative effect of FUV, EUV and X-ray disc photoevaporation on gas giant separations

    Science.gov (United States)

    Jennings, Jeff; Ercolano, Barbara; Rosotti, Giovanni P.

    2018-04-01

    Gas giants' early (≲ 5 Myr) orbital evolution occurs in a disc losing mass in part to photoevaporation driven by high energy irradiance from the host star. This process may ultimately overcome viscous accretion to disperse the disc and halt migrating giants by starving their orbits of gas, imprinting on giant planet separations in evolved systems. Inversion of this distribution could then give insight into whether stellar FUV, EUV or X-ray flux dominates photoevaporation, constraining planet formation and disc evolution models. We use a 1D hydrodynamic code in population syntheses for gas giants undergoing Type II migration in a viscously evolving disc subject to either a primarily FUV, EUV or X-ray flux from a pre-solar T Tauri star. The photoevaporative mass loss profile's unique peak location and width in each energetic regime produces characteristic features in the distribution of giant separations: a severe dearth of ≲ 2 MJ planets interior to 5 AU in the FUV scenario, a sharp concentration of ≲ 3 MJ planets between ≈1.5 - 2 AU in the EUV case, and a relative abundance of ≈2 - 3.5 MJ giants interior to 0.5 AU in the X-ray model. These features do not resemble the observational sample of gas giants with mass constraints, though our results do show some weaker qualitative similarities. We thus assess how the differing photoevaporative profiles interact with migrating giants and address the effects of large model uncertainties as a step to better connect disc models with trends in the exoplanet population.

  6. UNDERCOVER EUV SOLAR JETS OBSERVED BY THE INTERFACE REGION IMAGING SPECTROGRAPH

    Energy Technology Data Exchange (ETDEWEB)

    Chen, N.-H. [Korea Astronomy and Space Science Institute, Daejeon (Korea, Republic of); Innes, D. E. [Max-Planck-Institut für Sonnensystemforschung, D-37077 Göttingen (Germany)

    2016-12-10

    It is well-known that extreme ultraviolet (EUV) emission emitted at the solar surface is absorbed by overlying cool plasma. Especially in active regions, dark lanes in EUV images suggest that much of the surface activity is obscured. Simultaneous observations from the Interface Region Imaging Spectrograph, consisting of UV spectra and slit-jaw images (SJI), give vital information with sub-arcsecond spatial resolution on the dynamics of jets not seen in EUV images. We studied a series of small jets from recently formed bipole pairs beside the trailing spot of active region 11991, which occurred on 2014 March 5 from 15:02:21 UT to 17:04:07 UT. Collimated outflows with bright roots were present in SJI 1400 Å (transition region) and 2796 Å (upper chromosphere) that were mostly not seen in Atmospheric Imaging Assembly (AIA) 304 Å (transition region) and AIA 171 Å (lower corona) images. The Si iv spectra show a strong blue wing enhancement, but no red wing, in the line profiles of the ejecta for all recurrent jets, indicating outward flows without twists. We see two types of Mg ii line profiles produced by the jets spires: reversed and non-reversed. Mg ii lines remain optically thick, but turn optically thin in the highly Doppler shifted wings. The energy flux contained in each recurrent jet is estimated using a velocity differential emission measure technique that measures the emitting power of the plasma as a function of the line-of-sight velocity. We found that all the recurrent jets release similar energy (10{sup 8} erg cm{sup −2} s{sup −1}) toward the corona and the downward component is less than 3%.

  7. Optimization Design and Simulation of a Multi-Source Energy Harvester Based on Solar and Radioisotope Energy Sources

    Directory of Open Access Journals (Sweden)

    Hao Li

    2016-12-01

    Full Text Available A novel multi-source energy harvester based on solar and radioisotope energy sources is designed and simulated in this work. We established the calculation formulas for the short-circuit current and open-circuit voltage, and then studied and analyzed the optimization thickness of the semiconductor, doping concentration, and junction depth with simulation of the transport process of β particles in a semiconductor material using the Monte Carlo simulation program MCNP (version 5, Radiation Safety Information Computational Center, Oak Ridge, TN, USA. In order to improve the efficiency of converting solar light energy into electric power, we adopted PC1D (version 5.9, University of New South Wales, Sydney, Australia to optimize the parameters, and selected the best parameters for converting both the radioisotope energy and solar energy into electricity. The results concluded that the best parameters for the multi-source energy harvester are as follows: Na is 1 × 1019 cm−3, Nd is 3.8 × 1016 cm−3, a PN junction depth of 0.5 μm (using the 147Pm radioisotope source, and so on. Under these parameters, the proposed harvester can achieve a conversion efficiency of 5.05% for the 147Pm radioisotope source (with the activity of 9.25 × 108 Bq and 20.8% for solar light radiation (AM1.5. Such a design and parameters are valuable for some unique micro-power fields, such as applications in space, isolated terrestrial applications, and smart dust in battlefields.

  8. EUV beam splitter for use in the wavelength region around 6 nm

    International Nuclear Information System (INIS)

    Takenaka, Hisataka; Ichimaru, Satoshi; Gullikson, E.M.

    2005-01-01

    Extreme ultraviolet (EUV) beam splitters for use at a wavelength of around 6 nm were fabricated. The designs were optimized for Cr/C multilayers and incident angles of 45 deg. and 80 deg. . Measurements revealed the reflectivity of a Cr/C beam splitter to be 3.3% and the transmittance to be 5.6% at a wavelength of 6.36 nm and an incident angle of 45 deg. . The reflectivity of a Cr/C beam splitter was 5.8% and the transmittance was 6.6% at a wavelength of 6.15 nm and an incident angle of 80 deg.

  9. How to measure a-few-nanometer-small LER occurring in EUV lithography processed feature

    Science.gov (United States)

    Kawada, Hiroki; Kawasaki, Takahiro; Kakuta, Junichi; Ikota, Masami; Kondo, Tsuyoshi

    2018-03-01

    For EUV lithography features we want to decrease the dose and/or energy of CD-SEM's probe beam because LER decreases with severe resist-material's shrink. Under such conditions, however, measured LER increases from true LER, due to LER bias that is fake LER caused by random noise in SEM image. A gap error occurs between the right and the left LERs. In this work we propose new procedures to obtain true LER by excluding the LER bias from the measured LER. To verify it we propose a LER's reference-metrology using TEM.

  10. Problems in the fingerprints based polycyclic aromatic hydrocarbons source apportionment analysis and a practical solution.

    Science.gov (United States)

    Zou, Yonghong; Wang, Lixia; Christensen, Erik R

    2015-10-01

    This work intended to explain the challenges of the fingerprints based source apportionment method for polycyclic aromatic hydrocarbons (PAH) in the aquatic environment, and to illustrate a practical and robust solution. The PAH data detected in the sediment cores from the Illinois River provide the basis of this study. Principal component analysis (PCA) separates PAH compounds into two groups reflecting their possible airborne transport patterns; but it is not able to suggest specific sources. Not all positive matrix factorization (PMF) determined sources are distinguishable due to the variability of source fingerprints. However, they constitute useful suggestions for inputs for a Bayesian chemical mass balance (CMB) analysis. The Bayesian CMB analysis takes into account the measurement errors as well as the variations of source fingerprints, and provides a credible source apportionment. Major PAH sources for Illinois River sediments are traffic (35%), coke oven (24%), coal combustion (18%), and wood combustion (14%). Copyright © 2015. Published by Elsevier Ltd.

  11. A room temperature light source based on silicon nanowires

    Energy Technology Data Exchange (ETDEWEB)

    Lo Faro, M.J. [CNR-IPCF, Istituto per i Processi Chimico-Fisici, V. le F. Stagno D' Alcontres 37, 98158 Messina (Italy); MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Dipartimento di Fisica e Astronomia, Università di Catania, Via Santa Sofia 64, 95123 Catania (Italy); D' Andrea, C. [MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Messina, E.; Fazio, B. [CNR-IPCF, Istituto per i Processi Chimico-Fisici, V. le F. Stagno D' Alcontres 37, 98158 Messina (Italy); Musumeci, P. [Dipartimento di Fisica e Astronomia, Università di Catania, Via Santa Sofia 64, 95123 Catania (Italy); Franzò, G. [MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Gucciardi, P.G.; Vasi, C. [CNR-IPCF, Istituto per i Processi Chimico-Fisici, V. le F. Stagno D' Alcontres 37, 98158 Messina (Italy); Priolo, F. [MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Dipartimento di Fisica e Astronomia, Università di Catania, Via Santa Sofia 64, 95123 Catania (Italy); Scuola Superiore di Catania, Via Valdisavoia 9, 95123 Catania (Italy); Iacona, F. [MATIS CNR-IMM, Istituto per la Microelettronica e Microsistemi, Via Santa Sofia 64, 95123 Catania (Italy); Irrera, A., E-mail: irrera@me.cnr.it [CNR-IPCF, Istituto per i Processi Chimico-Fisici, V. le F. Stagno D' Alcontres 37, 98158 Messina (Italy)

    2016-08-31

    We synthesized ultrathin Si nanowires (NWs) by metal assisted chemical wet etching, using a very thin discontinuous Au layer as precursor for the process. A bright room temperature emission in the visible range due to electron–hole recombination in quantum confined Si NWs is reported. A single walled carbon nanotube (CNT) suspension was prepared and dispersed in Si NW samples. The hybrid Si NW/CNT system exhibits a double emission at room temperature, both in the visible (due to Si NWs) and the IR (due to CNTs) range, thus demonstrating the realization of a low-cost material with promising perspectives for applications in Si-based photonics. - Highlights: • Synthesis of ultrathin Si nanowires (NWs) by metal-assisted chemical etching • Synthesis of NW/carbon nanotube (CNT) hybrid systems • Structural characterization of Si NWs and Si NW/CNT • Room temperature photoluminescence (PL) properties of Si NWs and of Si NW/CNT • Tuning of the PL properties of the Si NW/CNT hybrid system.

  12. Centralized light-source optical access network based on polarization multiplexing.

    Science.gov (United States)

    Grassi, Fulvio; Mora, José; Ortega, Beatriz; Capmany, José

    2010-03-01

    This paper presents and demonstrates a centralized light source optical access network based on optical polarization multiplexing technique. By using two optical sources emitting light orthogonally polarized in the Central Node for downstream and upstream operations, the Remote Node is kept source-free. EVM values below telecommunication standard requirements have been measured experimentally when bidirectional digital signals have been transmitted over 10 km of SMF employing subcarrier multiplexing technique in the electrical domain.

  13. Spectrum shaping assessment of accelerator-based fusion neutron sources to be used in BNCT treatment

    Science.gov (United States)

    Cerullo, N.; Esposito, J.; Daquino, G. G.

    2004-01-01

    Monte Carlo modelling of an irradiation facility, for boron neutron capture therapy (BNCT) application, using a set of advanced type, accelerator based, 3H(d,n) 4He (D-T) fusion neutron source device is presented. Some general issues concerning the design of a proper irradiation beam shaping assembly, based on very hard energy neutron source spectrum, are reviewed. The facility here proposed, which represents an interesting solution compared to the much more investigated Li or Be based accelerator driven neutron source could fulfil all the medical and safety requirements to be used by an hospital environment.

  14. Design of a neutrino source based on beta beams

    Directory of Open Access Journals (Sweden)

    E. Wildner

    2014-07-01

    Full Text Available “Beta beams” produce collimated pure electron (antineutrino beams by accelerating beta active ions to high energies and having them decay in a racetrack shaped storage ring of 7 km circumference, the decay ring. EUROnu beta beams are based on CERN infrastructures and existing machines. Using existing machines may be an advantage for the cost evaluation, but will also constrain the physics performance. The isotope pair of choice for the beta beam is ^{6}He and ^{18}Ne. However, before the EUROnu studies one of the required isotopes, ^{18}Ne, could not be produced in rates that satisfy the needs for physics of the beta beam. Therefore, studies of alternative beta emitters, ^{8}Li and ^{8}B, with properties interesting for a beta beam have been proposed and have been studied within EUROnu. These alternative isotopes could be produced by using a small storage ring, in which the beam traverses a target, creating the ^{8}Li and ^{8}B isotopes. This production ring, the injection linac and the target system have been evaluated. Measurements of the cross section of the reactions to produce the beta beam isotopes show interesting results. A device to collect the produced isotopes from the target has been developed and tested. However, the yields of ^{8}Li and ^{8}B, using the production ring for production of ^{8}Li and ^{8}B, is not yet, according to simulations, giving the rates of isotopes that would be needed. Therefore, a new method of producing the ^{18}Ne isotope has been developed and tested giving good production rates. A 60 GHz ECRIS prototype, the first in the world, was developed and tested for ion production with contributions from EUROnu. The decay ring lattices for the ^{8}Li and ^{8}B have been developed and the lattice for ^{6}He and ^{18}Ne has been optimized to ensure the high intensity ion beam stability.

  15. Problems in the fingerprints based polycyclic aromatic hydrocarbons source apportionment analysis and a practical solution

    International Nuclear Information System (INIS)

    Zou, Yonghong; Wang, Lixia; Christensen, Erik R.

    2015-01-01

    This work intended to explain the challenges of the fingerprints based source apportionment method for polycyclic aromatic hydrocarbons (PAH) in the aquatic environment, and to illustrate a practical and robust solution. The PAH data detected in the sediment cores from the Illinois River provide the basis of this study. Principal component analysis (PCA) separates PAH compounds into two groups reflecting their possible airborne transport patterns; but it is not able to suggest specific sources. Not all positive matrix factorization (PMF) determined sources are distinguishable due to the variability of source fingerprints. However, they constitute useful suggestions for inputs for a Bayesian chemical mass balance (CMB) analysis. The Bayesian CMB analysis takes into account the measurement errors as well as the variations of source fingerprints, and provides a credible source apportionment. Major PAH sources for Illinois River sediments are traffic (35%), coke oven (24%), coal combustion (18%), and wood combustion (14%). - Highlights: • Fingerprint variability poses challenges in PAH source apportionment analysis. • PCA can be used to group compounds or cluster measurements. • PMF requires results validation but is useful for source suggestion. • Bayesian CMB provide practical and credible solution. - A Bayesian CMB model combined with PMF is a practical and credible fingerprints based PAH source apportionment method

  16. Assessment of air, water and land-based sources of pollution in the ...

    African Journals Online (AJOL)

    A quantitative assessment of air, water and land-based sources of pollution to the coastal zone of the Accra-Tema Metropolitan Area of Ghana was conducted by making an emission inventory from information on industrial, commercial and domestic activities. Three sources of air pollution were analysed, viz, emission from ...

  17. Effective temperature of an ultracold electron source based on near-threshold photoionization

    NARCIS (Netherlands)

    Engelen, W.J.; Smakman, E.P.; Bakker, D.J.; Luiten, O.J.; Vredenbregt, E.J.D.

    2014-01-01

    We present a detailed description of measurements of the effective temperature of a pulsed electron source, based on near-threshold photoionization of laser-cooled atoms. The temperature is determined by electron beam waist scans, source size measurements with ion beams, and analysis with an

  18. Taurine supplemented plant protein based diets with alternative lipid sources for juvenile sea bream, sparus aurata

    Science.gov (United States)

    Two lipid sources were evaluated as fish oil replacements in fishmeal free, plant protein based diets for juvenile gilthead sea bream, Sparus aurata. A twelve week feeding study was undertaken to examine the performance of fish fed the diets with different sources of essential fatty acids (canola o...

  19. High-brightness electron guns for linac-based light sources

    International Nuclear Information System (INIS)

    Lewellen, J.W.

    2004-01-01

    Most proposed linac-based light sources, such as single-pass free-electron lasers and energy-recovery-linacs, require very high-brightness electron beams in order to achieve their design performance. These beam requirements must be achieved not on an occasional basis, but rather must be met by every bunch produced by the source over extended periods of time. It is widely assumed that the beam source will be a photocathode electron gun; the selection of accelerator technique (e.g., dc or rf) for the gun is more dependent on the application.The current state of the art of electron beam production is adequate but not ideal for the first generation of linac-based light sources, such as the Linac Coherent Light Source (LCLS) x-ray free-electron laser (X-FEL). For the next generation of linac-based light sources, an order of magnitude reduction in the transverse electron beam emittance is required to significantly reduce the cost of the facility. This is beyond the present state of the art, given the other beam properties that must be maintained. The requirements for current and future linac-based light source beam sources are presented here, along with a review of the present state of the art. A discussion of potential paths towards meeting future needs is presented at the conclusion.

  20. Land-based sources of pollution and environmental quality of Weija ...

    African Journals Online (AJOL)

    A survey of land-based sources of pollution was undertaken in the catchment area of Weija Lake. Activities that may influence the quality of the environment, and the sources, amounts and effects of the pollution of the water body were assessed. Water and precipitation chemistry showed that Na:Ca (0.48) and Na:K (2.0) ...

  1. Search for lost or orphan radioactive sources based on NaI gamma spectrometry

    International Nuclear Information System (INIS)

    Aage, H.K.; Korsbech, U.

    2003-01-01

    Within recent decades many radioactive sources have been lost, stolen, or abandoned, and some have caused contamination or irradiation of people. Therefore reliable methods for source recovery are needed. The use of car borne NaI(Tl) detectors is discussed. Standard processing of spectra in general can disclose strong and medium level signals from manmade nuclides. But methods for detecting low level signals from weak, distant or shielded sources can be improved. New methods for source detection and identification based on noise adjusted singular value decomposition and on area specific stripping of spectra are presented

  2. Iterative observer based method for source localization problem for Poisson equation in 3D

    KAUST Repository

    Majeed, Muhammad Usman; Laleg-Kirati, Taous-Meriem

    2017-01-01

    A state-observer based method is developed to solve point source localization problem for Poisson equation in a 3D rectangular prism with available boundary data. The technique requires a weighted sum of solutions of multiple boundary data

  3. Photoacoustic Techniques for Trace Gas Sensing Based on Semiconductor Laser Sources

    Directory of Open Access Journals (Sweden)

    Vincenzo Spagnolo

    2009-12-01

    Full Text Available The paper provides an overview on the use of photoacoustic sensors based on semiconductor laser sources for the detection of trace gases. We review the results obtained using standard, differential and quartz enhanced photoacoustic techniques.

  4. AlInGaN-Based Superlattice Terahertz Source, Phase I

    Data.gov (United States)

    National Aeronautics and Space Administration — WaveBand Corporation in collaboration with Virginia Commonwealth University proposes to design and fabricate a new sub-millimeter source based on an InAlGaN...

  5. Evaluation of smoothing in an iterative lp-norm minimization algorithm for surface-based source localization of MEG

    Science.gov (United States)

    Han, Jooman; Sic Kim, June; Chung, Chun Kee; Park, Kwang Suk

    2007-08-01

    The imaging of neural sources of magnetoencephalographic data based on distributed source models requires additional constraints on the source distribution in order to overcome ill-posedness and obtain a plausible solution. The minimum lp norm (0 temporal gyrus.

  6. Rocket flight of a multilayer coated high-density EUV toroidal grating

    Science.gov (United States)

    Keski-Kuha, Ritva A. M.; Thomas, Roger J.; Davila, Joseph M.

    1992-01-01

    A multilayer coated high density toroidal grating was flown on a sounding rocket experiment in the Solar EUV Rocket Telescope and Spectrograph (SERTS) instrument. To our knowledge this is the first space flight of a multilayer coated grating. Pre-flight performance evaluation showed that the application of a 10-layer Ir/Si multilayer coating to the 3600 l/mm blazed toroidal replica grating produced a factor of 9 enhancement in peak efficiency near the design wavelength around 30 nm in first order over the standard gold coating, with a measured EUV efficiency that peaked at 3.3 percent. In addition, the grating's spectral resolution of better than 5000 was maintained. The region of enhanced grating efficiency due to the multilayer coating is clearly evident in the flight data. Within the bandpass of the multilayer coating, the recorded film densities were roughly equivalent to those obtained with a factor of six longer exposure on the previous flight of the SERTS instrument.

  7. EUV FLICKERING OF SOLAR CORONAL LOOPS: A NEW DIAGNOSTIC OF CORONAL HEATING

    Energy Technology Data Exchange (ETDEWEB)

    Tajfirouze, E.; Reale, F.; Peres, G. [Dipartimento di Fisica e Chimica, Università di Palermo, Piazza del Parlamento 1, I-90134 (Italy); Testa, P., E-mail: reale@astropa.unipa.it [Harvard-Smithsonian Center for Astrophysics, 60 Garden Street, Cambridge, MA 02138 (United States)

    2016-02-01

    A previous work of ours found the best agreement between EUV light curves observed in an active region core (with evidence of super-hot plasma) and those predicted from a model with a random combination of many pulse-heated strands with a power-law energy distribution. We extend that work by including spatially resolved strand modeling and by studying the evolution of emission along the loops in the EUV 94 Å and 335 Å channels of the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory. Using the best parameters of the previous work as the input of the present one, we find that the amplitude of the random fluctuations driven by the random heat pulses increases from the bottom to the top of the loop in the 94 Å channel and from the top to the bottom in the 335 Å channel. This prediction is confirmed by the observation of a set of aligned neighboring pixels along a bright arc of an active region core. Maps of pixel fluctuations may therefore provide easy diagnostics of nanoflaring regions.

  8. Dynamics of the spatial electron density distribution of EUV-induced plasmas

    Science.gov (United States)

    van der Horst, R. M.; Beckers, J.; Osorio, E. A.; Banine, V. Y.

    2015-11-01

    We studied the temporal evolution of the electron density distribution in a low pressure pulsed plasma induced by high energy extreme ultraviolet (EUV) photons using microwave cavity resonance spectroscopy (MCRS). In principle, MCRS only provides space averaged information about the electron density. However, we demonstrate here the possibility to obtain spatial information by combining multiple resonant modes. It is shown that EUV-induced plasmas, albeit being a rather exotic plasma, can be explained by known plasma physical laws and processes. Two stages of plasma behaviour are observed: first the electron density distribution contracts, after which it expands. It is shown that the contraction is due to cooling of the electrons. The moment when the density distribution starts to expand is related to the inertia of the ions. After tens of microseconds, the electrons reached the wall of the cavity. The speed of this expansion is dependent on the gas pressure and can be divided into two regimes. It is shown that the acoustic dominated regime the expansion speed is independent of the gas pressure and that in the diffusion dominated regime the expansion depends reciprocal on the gas pressure.

  9. Dynamics of the spatial electron density distribution of EUV-induced plasmas

    International Nuclear Information System (INIS)

    Van der Horst, R M; Beckers, J; Banine, V Y; Osorio, E A

    2015-01-01

    We studied the temporal evolution of the electron density distribution in a low pressure pulsed plasma induced by high energy extreme ultraviolet (EUV) photons using microwave cavity resonance spectroscopy (MCRS). In principle, MCRS only provides space averaged information about the electron density. However, we demonstrate here the possibility to obtain spatial information by combining multiple resonant modes. It is shown that EUV-induced plasmas, albeit being a rather exotic plasma, can be explained by known plasma physical laws and processes. Two stages of plasma behaviour are observed: first the electron density distribution contracts, after which it expands. It is shown that the contraction is due to cooling of the electrons. The moment when the density distribution starts to expand is related to the inertia of the ions. After tens of microseconds, the electrons reached the wall of the cavity. The speed of this expansion is dependent on the gas pressure and can be divided into two regimes. It is shown that the acoustic dominated regime the expansion speed is independent of the gas pressure and that in the diffusion dominated regime the expansion depends reciprocal on the gas pressure. (fast track communication)

  10. EUV patterning using CAR or MOX photoresist at low dose exposure for sub 36nm pitch

    Science.gov (United States)

    Thibaut, Sophie; Raley, Angélique; Lazarrino, Frederic; Mao, Ming; De Simone, Danilo; Piumi, Daniele; Barla, Kathy; Ko, Akiteru; Metz, Andrew; Kumar, Kaushik; Biolsi, Peter

    2018-04-01

    The semiconductor industry has been pushing the limits of scalability by combining 193nm immersion lithography with multi-patterning techniques for several years. Those integrations have been declined in a wide variety of options to lower their cost but retain their inherent variability and process complexity. EUV lithography offers a much desired path that allows for direct print of line and space at 36nm pitch and below and effectively addresses issues like cycle time, intra-level overlay and mask count costs associated with multi-patterning. However it also brings its own sets of challenges. One of the major barrier to high volume manufacturing implementation has been hitting the 250W power exposure required for adequate throughput [1]. Enabling patterning using a lower dose resist could help move us closer to the HVM throughput targets assuming required performance for roughness and pattern transfer can be met. As plasma etching is known to reduce line edge roughness on 193nm lithography printed features [2], we investigate in this paper the level of roughness that can be achieved on EUV photoresist exposed at a lower dose through etch process optimization into a typical back end of line film stack. We will study 16nm lines printed at 32 and 34nm pitch. MOX and CAR photoresist performance will be compared. We will review step by step etch chemistry development to reach adequate selectivity and roughness reduction to successfully pattern the target layer.

  11. Open-Source web-based geographical information system for health exposure assessment

    Directory of Open Access Journals (Sweden)

    Evans Barry

    2012-01-01

    Full Text Available Abstract This paper presents the design and development of an open source web-based Geographical Information System allowing users to visualise, customise and interact with spatial data within their web browser. The developed application shows that by using solely Open Source software it was possible to develop a customisable web based GIS application that provides functions necessary to convey health and environmental data to experts and non-experts alike without the requirement of proprietary software.

  12. Open-Source web-based geographical information system for health exposure assessment

    DEFF Research Database (Denmark)

    Evans, Barry; Sabel, Clive E

    2012-01-01

    This paper presents the design and development of an open source web-based Geographical Information System allowing users to visualise, customise and interact with spatial data within their web browser. The developed application shows that by using solely Open Source software it was possible to d...... to develop a customisable web based GIS application that provides functions necessary to convey health and environmental data to experts and non-experts alike without the requirement of proprietary software....

  13. Applying open source data visualization tools to standard based medical data.

    Science.gov (United States)

    Kopanitsa, Georgy; Taranik, Maxim

    2014-01-01

    Presentation of medical data in personal health records (PHRs) requires flexible platform independent tools to ensure easy access to the information. Different backgrounds of the patients, especially elder people require simple graphical presentation of the data. Data in PHRs can be collected from heterogeneous sources. Application of standard based medical data allows development of generic visualization methods. Focusing on the deployment of Open Source Tools, in this paper we applied Java Script libraries to create data presentations for standard based medical data.

  14. An RF ion source based primary ion gun for secondary ion mass spectroscopy

    International Nuclear Information System (INIS)

    Menon, Ranjini; Nabhiraj, P.Y.; Bhandari, R.K.

    2011-01-01

    In this article we present the design, development and characterization of an RF plasma based ion gun as a primary ion gun for SIMS application. RF ion sources, in particular Inductively Coupled Plasma (ICP) ion sources are superior compared to LMIS and duoplasmtron ion sources since they are filamentless, can produce ions of gaseous elements. At the same time, ICP ion sources offer high angular current density which is an important factor in producing high current in small spot size on the target. These high current microprobes improve the signal to noise ratio by three orders as compared to low current ion sources such as LMIS. In addition, the high current microprobes have higher surface and depth profiling speeds. In this article we describe a simple ion source in its very basic form, two lens optical column and characteristics of microprobe

  15. An Emulated PV Source Based on an Unilluminated Solar Panel and DC Power Supply

    Directory of Open Access Journals (Sweden)

    Zhongfu Zhou

    2017-12-01

    Full Text Available This paper provides a review on various PV simulator technologies as well as presents a novel equivalent photovoltaic (PV source that was constructed by using un-illuminated solar panels and a DC power supply that operates in current source mode. The constructed PV source was used for testing photovoltaic converters and various maximum power point tracking (MPPT algorithms required for capturing the maximum possible output power. The mathematical model and electrical characteristics of the constructed PV source were defined and analyzed in detail in the paper. The constructed PV source has the advantages of high bandwidth over the switching circuit based PV simulators. The constructed PV source has been used for testing various power electronics converters and various control techniques effectively in laboratory environments for researchers and university students.

  16. A new coaxial high power microwave source based on dual beams

    International Nuclear Information System (INIS)

    Li, Yangmei; Zhang, Xiaoping; Qi, Zumin; Dang, Fangchao; Qian, Baoliang

    2014-01-01

    We present a new coaxial high power microwave source based on dual beams, which combines a relativistic backward wave oscillator (RBWO) (noted as the inner sub-source below) and a coaxial transit-time oscillator (TTO) (noted as the outer sub-source). The cathode consists of an inner and an outer annular cathode, which provides the inner and the outer annular electron beam for the sub-sources, respectively. Particle-in-cell (PIC) simulation results demonstrate that power conversion efficiencies of the two sub-sources with an identical frequency of 9.74 GHz are 29% and 25%, respectively. It is furthermore found that phase locking between the inner and the outer sub-sources can be realized, which suggests a feasibility to obtain a higher power output if the two microwave signals are coherently combined

  17. A new coaxial high power microwave source based on dual beams

    Energy Technology Data Exchange (ETDEWEB)

    Li, Yangmei, E-mail: sunberry1211@hotmail.com; Zhang, Xiaoping; Qi, Zumin; Dang, Fangchao; Qian, Baoliang [College of Optoelectric Science and Engineering, National University of Defense Technology, Changsha 410073 (China)

    2014-05-15

    We present a new coaxial high power microwave source based on dual beams, which combines a relativistic backward wave oscillator (RBWO) (noted as the inner sub-source below) and a coaxial transit-time oscillator (TTO) (noted as the outer sub-source). The cathode consists of an inner and an outer annular cathode, which provides the inner and the outer annular electron beam for the sub-sources, respectively. Particle-in-cell (PIC) simulation results demonstrate that power conversion efficiencies of the two sub-sources with an identical frequency of 9.74 GHz are 29% and 25%, respectively. It is furthermore found that phase locking between the inner and the outer sub-sources can be realized, which suggests a feasibility to obtain a higher power output if the two microwave signals are coherently combined.

  18. Two Model-Based Methods for Policy Analyses of Fine Particulate Matter Control in China: Source Apportionment and Source Sensitivity

    Science.gov (United States)

    Li, X.; Zhang, Y.; Zheng, B.; Zhang, Q.; He, K.

    2013-12-01

    Anthropogenic emissions have been controlled in recent years in China to mitigate fine particulate matter (PM2.5) pollution. Recent studies show that sulfate dioxide (SO2)-only control cannot reduce total PM2.5 levels efficiently. Other species such as nitrogen oxide, ammonia, black carbon, and organic carbon may be equally important during particular seasons. Furthermore, each species is emitted from several anthropogenic sectors (e.g., industry, power plant, transportation, residential and agriculture). On the other hand, contribution of one emission sector to PM2.5 represents contributions of all species in this sector. In this work, two model-based methods are used to identify the most influential emission sectors and areas to PM2.5. The first method is the source apportionment (SA) based on the Particulate Source Apportionment Technology (PSAT) available in the Comprehensive Air Quality Model with extensions (CAMx) driven by meteorological predictions of the Weather Research and Forecast (WRF) model. The second method is the source sensitivity (SS) based on an adjoint integration technique (AIT) available in the GEOS-Chem model. The SA method attributes simulated PM2.5 concentrations to each emission group, while the SS method calculates their sensitivity to each emission group, accounting for the non-linear relationship between PM2.5 and its precursors. Despite their differences, the complementary nature of the two methods enables a complete analysis of source-receptor relationships to support emission control policies. Our objectives are to quantify the contributions of each emission group/area to PM2.5 in the receptor areas and to intercompare results from the two methods to gain a comprehensive understanding of the role of emission sources in PM2.5 formation. The results will be compared in terms of the magnitudes and rankings of SS or SA of emitted species and emission groups/areas. GEOS-Chem with AIT is applied over East Asia at a horizontal grid

  19. Note: Tormenta: An open source Python-powered control software for camera based optical microscopy.

    Science.gov (United States)

    Barabas, Federico M; Masullo, Luciano A; Stefani, Fernando D

    2016-12-01

    Until recently, PC control and synchronization of scientific instruments was only possible through closed-source expensive frameworks like National Instruments' LabVIEW. Nowadays, efficient cost-free alternatives are available in the context of a continuously growing community of open-source software developers. Here, we report on Tormenta, a modular open-source software for the control of camera-based optical microscopes. Tormenta is built on Python, works on multiple operating systems, and includes some key features for fluorescence nanoscopy based on single molecule localization.

  20. Real-time tunability of chip-based light source enabled by microfluidic mixing

    DEFF Research Database (Denmark)

    Olsen, Brian Bilenberg; Rasmussen, Torben; Balslev, Søren

    2006-01-01

    We demonstrate real-time tunability of a chip-based liquid light source enabled by microfluidic mixing. The mixer and light source are fabricated in SU-8 which is suitable for integration in SU-8-based laboratory-on-a-chip microsystems. The tunability of the light source is achieved by changing...... the concentration of rhodamine 6G dye inside two integrated vertical resonators, since both the refractive index and the gain profile are influenced by the dye concentration. The effect on the refractive index and the gain profile of rhodamine 6G in ethanol is investigated and the continuous tuning of the laser...

  1. Design and development of the network based system for the supervision of radioactive sources

    International Nuclear Information System (INIS)

    Yang Yaoyun; Su Genghua; Zhang Hui; Li Junli; Zhu Li

    2010-01-01

    Objective: To help the environmental protection authorities to upgrade the management of the related organizations and radioactive sources and improve the information level of nuclear technology utilization's supervision. Methods: On the basis of investigation of requirements, the network based system for the supervision of radioactive sources was divided into application system and supervision system, based on MYSQL and SQL Server2005 respectively. Results: The system satisfied the current requirements of the nuclear technology utilization's supervision and is in nationwide operation. Conclusion: The system achieved the dynamic tracking management of radioactive sources and improved the efficiency and level of radiation safety supervision in nuclear technology utilizations. (authors)

  2. RSS-based localization of isotropically decaying source with unknown power and pathloss factor

    International Nuclear Information System (INIS)

    Sun, Shunyuan; Sun, Li; Ding, Zhiguo

    2016-01-01

    This paper addresses the localization of an isotropically decaying source based on the received signal strength (RSS) measurements that are collected from nearby active sensors that are position-known and wirelessly connected, and it propose a novel iterative algorithm for RSS-based source localization in order to improve the location accuracy and realize real-time location and automatic monitoring for hospital patients and medical equipment in the smart hospital. In particular, we consider the general case where the source power and pathloss factor are both unknown. For such a source localization problem, we propose an iterative algorithm, in which the unknown source position and two other unknown parameters (i.e. the source power and pathloss factor) are estimated in an alternating way based on each other, with our proposed sub-optimum initial estimate on source position obtained based on the RSS measurements that are collected from a few (closest) active sensors with largest RSS values. Analysis and simulation study show that our proposed iterative algorithm guarantees globally convergence to the least-squares (LS) solution, where for our suitably assumed independent and identically distributed (i.i.d.) zero-mean Gaussian RSS measurement errors the converged localization performance achieves the optimum that corresponds to the Cramer–Rao lower bound (CRLB).

  3. An incentive-based source separation model for sustainable municipal solid waste management in China.

    Science.gov (United States)

    Xu, Wanying; Zhou, Chuanbin; Lan, Yajun; Jin, Jiasheng; Cao, Aixin

    2015-05-01

    Municipal solid waste (MSW) management (MSWM) is most important and challenging in large urban communities. Sound community-based waste management systems normally include waste reduction and material recycling elements, often entailing the separation of recyclable materials by the residents. To increase the efficiency of source separation and recycling, an incentive-based source separation model was designed and this model was tested in 76 households in Guiyang, a city of almost three million people in southwest China. This model embraced the concepts of rewarding households for sorting organic waste, government funds for waste reduction, and introducing small recycling enterprises for promoting source separation. Results show that after one year of operation, the waste reduction rate was 87.3%, and the comprehensive net benefit under the incentive-based source separation model increased by 18.3 CNY tonne(-1) (2.4 Euros tonne(-1)), compared to that under the normal model. The stakeholder analysis (SA) shows that the centralized MSW disposal enterprises had minimum interest and may oppose the start-up of a new recycling system, while small recycling enterprises had a primary interest in promoting the incentive-based source separation model, but they had the least ability to make any change to the current recycling system. The strategies for promoting this incentive-based source separation model are also discussed in this study. © The Author(s) 2015.

  4. Temporal-spatial distribution of non-point source pollution in a drinking water source reservoir watershed based on SWAT

    Directory of Open Access Journals (Sweden)

    M. Wang

    2015-05-01

    Full Text Available The conservation of drinking water source reservoirs has a close relationship between regional economic development and people’s livelihood. Research on the non-point pollution characteristics in its watershed is crucial for reservoir security. Tang Pu Reservoir watershed was selected as the study area. The non-point pollution model of Tang Pu Reservoir was established based on the SWAT (Soil and Water Assessment Tool model. The model was adjusted to analyse the temporal-spatial distribution patterns of total nitrogen (TN and total phosphorus (TP. The results showed that the loss of TN and TP in the reservoir watershed were related to precipitation in flood season. And the annual changes showed an "M" shape. It was found that the contribution of loss of TN and TP accounted for 84.5% and 85.3% in high flow years, and for 70.3% and 69.7% in low flow years, respectively. The contributions in normal flow years were 62.9% and 63.3%, respectively. The TN and TP mainly arise from Wangtan town, Gulai town, and Wangyuan town, etc. In addition, it was found that the source of TN and TP showed consistency in space.

  5. Thinking about online sources: Exploring students' epistemic cognition in internet-based chemistry learning

    Science.gov (United States)

    Dai, Ting

    This dissertation investigated the relation between epistemic cognition---epistemic aims and source beliefs---and learning outcome in an Internet--based research context. Based on a framework of epistemic cognition (Chinn, Buckland, & Samarapungavan, 2011), a context--specific epistemic aims and source beliefs questionnaire (CEASBQ) was developed and administered to 354 students from college--level introductory chemistry courses. A series of multitrait--multimethod model comparisons provided evidence for construct convergent and discriminant validity for three epistemic aims--- true beliefs, justified beliefs, explanatory connection, which were all distinguished from, yet correlated with, mastery goals. Students' epistemic aims were specific to the chemistry topics in research. Multidimensional scaling results indicated that students' source evaluation was based on two dimensions--- professional expertise and first--hand knowledge, suggesting a multidimensional structure of source beliefs. Most importantly, online learning outcome was found to be significantly associated with two epistemic aims---justified beliefs and explanatory connection: The more students sought justifications in the online research, the lower they tended to score on the learning outcome measure, whereas the more students sought explanatory connections between information, the higher they scored on the outcome measure. There was a significant but small positive association between source beliefs and learning outcome. The influences of epistemic aims and source beliefs on learning outcome were found to be above and beyond the effects of a number of covariates, including prior knowledge and perceived ability with online sources.

  6. Analysis of Ozone (O3 and Erythemal UV (EUV measured by TOMS in the equatorial African belt

    Directory of Open Access Journals (Sweden)

    Øyvind Frette

    2010-03-01

    Full Text Available We presented time series of total ozone column amounts (TOCAs and erythemal UV (EUV doses derived from measurements by TOMS (Total Ozone Mapping Spectrometer instruments on board the Nimbus-7 (N7 and the Earth Probe (EP satellites for three locations within the equatorial African belt for the period 1979 to 2000. The locations were Dar-es-Salaam (6.8° S, 39.26° E in Tanzania, Kampala (0.19° N, 32.34° E in Uganda, and Serrekunda (13.28° N, 16.34° W in Gambia. Equatorial Africa has high levels of UV radiation, and because ozone shields UV radiation from reaching the Earth’s surface, there is a need to monitor TOCAs and EUV doses. In this paper we investigated the trend of TOCAs and EUV doses, the effects of annual and solar cycles on TOCAs, as well as the link between lightning and ozone production in the equatorial African belt. We also compared clear-sky simulated EUV doses with the corresponding EUV doses derived from TOMS measurements. The TOCAs were found to vary in the ranges 243 DU − 289 DU, 231 DU − 286 DU, and 236 DU − 296 DU, with mean values of 266.9 DU, 260.9 DU, and 267.8 DU for Dar-es-Salaam, Kampala and Serrekunda, respectively. Daily TOCA time series indicated that Kampala had the lowest TOCA values, which we attributed to the altitude effect. There were two annual ozone peaks in Dar-es-Salaam and Kampala, and one annual ozone peak in Serrekunda. The yearly TOCA averages showed an oscillation within a five-year period. We also found that the EUV doses were stable at all three locations for the period 1979−2000, and that Kampala and Dar-es-Salaam were mostly cloudy throughout the year, whereas Serrekunda was mostly free from clouds. It was also found that clouds were among the major factors determining the level of EUV reaching the Earth´s surface. Finally, we noted that during rainy seasons, horizontal advection effects augmented by lightning activity may be responsible for enhanced ozone production in the tropics.

  7. [Nitrogen non-point source pollution identification based on ArcSWAT in Changle River].

    Science.gov (United States)

    Deng, Ou-Ping; Sun, Si-Yang; Lü, Jun

    2013-04-01

    The ArcSWAT (Soil and Water Assessment Tool) model was adopted for Non-point source (NPS) nitrogen pollution modeling and nitrogen source apportionment for the Changle River watershed, a typical agricultural watershed in Southeast China. Water quality and hydrological parameters were monitored, and the watershed natural conditions (including soil, climate, land use, etc) and pollution sources information were also investigated and collected for SWAT database. The ArcSWAT model was established in the Changle River after the calibrating and validating procedures of the model parameters. Based on the validated SWAT model, the contributions of different nitrogen sources to river TN loading were quantified, and spatial-temporal distributions of NPS nitrogen export to rivers were addressed. The results showed that in the Changle River watershed, Nitrogen fertilizer, nitrogen air deposition and nitrogen soil pool were the prominent pollution sources, which contributed 35%, 32% and 25% to the river TN loading, respectively. There were spatial-temporal variations in the critical sources for NPS TN export to the river. Natural sources, such as soil nitrogen pool and atmospheric nitrogen deposition, should be targeted as the critical sources for river TN pollution during the rainy seasons. Chemical nitrogen fertilizer application should be targeted as the critical sources for river TN pollution during the crop growing season. Chemical nitrogen fertilizer application, soil nitrogen pool and atmospheric nitrogen deposition were the main sources for TN exported from the garden plot, forest and residential land, respectively. However, they were the main sources for TN exported both from the upland and paddy field. These results revealed that NPS pollution controlling rules should focus on the spatio-temporal distribution of NPS pollution sources.

  8. Laser-assisted vacuum arc extreme ultraviolet source: a comparison of picosecond and nanosecond laser triggering

    Science.gov (United States)

    Beyene, Girum A.; Tobin, Isaac; Juschkin, Larissa; Hayden, Patrick; O'Sullivan, Gerry; Sokell, Emma; Zakharov, Vassily S.; Zakharov, Sergey V.; O'Reilly, Fergal

    2016-06-01

    Extreme ultraviolet (EUV) light generation by hybrid laser-assisted vacuum arc discharge plasmas, utilizing Sn-coated rotating-disc-electrodes, was investigated. The discharge was initiated by localized ablation of the liquid tin coating of the cathode disc by a laser pulse. The laser pulse, at 1064 nm, was generated by Nd:YAG lasers with variable energy from 1 to 100 mJ per pulse. The impact of shortening the laser pulse from 7 ns to 170 ps on the EUV generation has been investigated in detail. The use of ps pulses resulted in an increase in emission of EUV radiation. With a fixed discharge energy of ~4 J, the EUV conversion efficiency tends to plateau at ~2.4  ±  0.25% for the ps laser pulses, while for the ns pulses, it saturates at ~1.7  ±  0.3%. Under similar discharge and laser energy conditions, operating the EUV source with the ps-triggering resulted also in narrower spectral profiles of the emission in comparison to ns-triggering. The results indicate an advantage in using ps-triggering in laser-assisted discharges to produce brighter plasmas required for applications such as metrology.

  9. Effect of solar UV/EUV heating on the intensity and spatial distribution of Jupiter's synchrotron radiation

    Science.gov (United States)

    Kita, H.; Misawa, H.; Tsuchiya, F.; Tao, C.; Morioka, A.

    2013-10-01

    We analyzed the Very Large Array archived data observed in 2000 to determine whether solar ultraviolet (UV)/extreme ultraviolet (EUV) heating of the Jovian thermosphere causes variations in the total flux density and dawn-dusk asymmetry (the characteristic differences between the peak emissions at dawn and dusk) of Jupiter's synchrotron radiation (JSR). The total flux density varied by 10% over 6 days of observations and accorded with theoretical expectations. The average dawn-dusk peak emission ratio indicated that the dawn side emissions were brighter than those on the dusk side and this was expected to have been caused by diurnal wind induced by the solar UV/EUV. The daily variations in the dawn-dusk ratio did not correspond to the solar UV/EUV, and this finding did not support the theoretical expectation that the dawn-dusk ratio and diurnal wind velocity varies in correspondence with the solar UV/EUV. We tried to determine whether the average dawn-dusk ratio could be explained by a reasonable diurnal wind velocity. We constructed an equatorial brightness distribution model of JSR using the revised Divine-Garrett particle distribution model and used it to derive a relation between the dawn-dusk ratio and diurnal wind velocity. The estimated diurnal wind velocity reasonably corresponded to a numerical simulation of the Jovian thermosphere. We also found that realistic changes in the diurnal wind velocity could not cause the daily variations in the dawn-dusk ratio. Hence, we propose that the solar UV/EUV related variations were below the detection limit and some other processes dominated the daily variations in the dawn-dusk ratio.

  10. Partial differential equation-based localization of a monopole source from a circular array.

    Science.gov (United States)

    Ando, Shigeru; Nara, Takaaki; Levy, Tsukassa

    2013-10-01

    Wave source localization from a sensor array has long been the most active research topics in both theory and application. In this paper, an explicit and time-domain inversion method for the direction and distance of a monopole source from a circular array is proposed. The approach is based on a mathematical technique, the weighted integral method, for signal/source parameter estimation. It begins with an exact form of the source-constraint partial differential equation that describes the unilateral propagation of wide-band waves from a single source, and leads to exact algebraic equations that include circular Fourier coefficients (phase mode measurements) as their coefficients. From them, nearly closed-form, single-shot and multishot algorithms are obtained that is suitable for use with band-pass/differential filter banks. Numerical evaluation and several experimental results obtained using a 16-element circular microphone array are presented to verify the validity of the proposed method.

  11. 37Ar based neutron source for calibration of the iodine solar neutrino detector

    International Nuclear Information System (INIS)

    Abdurashitov, D.N.; Gavrin, V.N.; Mirmov, I.N.; Veretenkin, E.P.; Yants, V.Eh.; Cleveland, B.T.; Davis, R. Jr.; Lande, K.; Wildenhain, P.; Khomyakov, Yu.S.

    2001-01-01

    The methodology of the creation of a compact neutrino source based on the 37 Ar isotope as well as the technique of calibration of an iodine detector of solar neutrinos is described. An important overall expected result is the creation of a prototype of the source with the intensity up to 400 kCi, delivery of this source to the Baksan neutrino observatory and the test calibration of the single module of the iodine detector. Simulation shows that at least 45-70 127 Xe atoms will be detected in the irradiation of ∼40 tons of methylene iodide by the source leading to ∼19% of the error on the measured production rate. This result should be considered as a test of the developed technology and will verify overall technical readiness for the creation of a full scale neutrino source and the full scale calibration of the iodine detector

  12. Establishment of radioactive source retirement mechanism based on the method of environmental liability insurance

    International Nuclear Information System (INIS)

    Wang Hongwei

    2013-01-01

    The retirement of radioactive source is a difficult problem that we are facing during the radiation safety regulation in China. This paper analyses the reason of the problem regarding the retirement of radioactive source both from the utilization units and the regulatory body. It is considered that the basic reason is the enterprises don't arrange and use the retirement funds reasonably, which is an economic problem. There exists a limitation when facing the radioactive source retirement in light of licensing and regulation mechanism of the manufacture, selling, uses of radioactive sources in China, and the key to solve this economic problem is to introduce economic method, Some measures and suggestions are given to establish radioactive sources retirement mechanism by using economic methods, based on the comprehensive analysis of the concept, development and function of the environmental liability insurance. (author)

  13. Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

    Science.gov (United States)

    van Setten, Eelco; Bottiglieri, Gerardo; de Winter, Laurens; McNamara, John; Rusu, Paul; Lubkoll, Jan; Rispens, Gijsbert; van Schoot, Jan; Neumann, Jens Timo; Roesch, Matthias; Kneer, Bernhard

    2017-10-01

    To enable cost-effective shrink at the 3nm node and beyond, and to extend Moore's law into the next decade, ASML is developing a new high-NA EUV platform. The high-NA system is targeted to feature a numerical aperture (NA) of 0.55 to extend the single exposure resolution limit to 8nm half pitch. The system is being designed to achieve an on-product-overlay (OPO) performance well below 2nm, a high image contrast to drive down local CD errors and to obtain global CDU at sub-1nm level to be able to meet customer edge placement error (EPE) requirements for the devices of the future. EUV scanners employ reflective Bragg multi-layer mirrors in the mask and in the Projection Optics Box (POB) that is used to project the mask pattern into the photoresist on the silicon wafer. These MoSi multi-layer mirrors are tuned for maximum reflectivity, and thus productivity, at 13.5nm wavelength. The angular range of incident light for which a high reflectivity at the reticle can be obtained is limited to +/- 11o, exceeding the maximum angle occurring in current 0.33NA scanners at 4x demagnification. At 0.55NA the maximum angle at reticle level would extend up to 17o in the critical (scanning) direction and compromise the imaging performance of horizontal features severely. To circumvent this issue a novel anamorphic optics design has been introduced, which has a 4x demagnification in the X- (slit) direction and 8x demagnification in the Y- (scanning) direction as well as a central obscuration in the exit pupil. In this work we will show that the EUV high-NA anamorphic concept can successfully solve the angular reflectivity issues and provide good imaging performance in both directions. Several unique imaging challenges in comparison to the 0.33NA isomorphic baseline are being studied, such as the impact of the central obscuration in the POB and Mask-3D effects at increased NA that seem most pronounced for vertical features. These include M3D induced contrast loss and non

  14. Development of an open-source web-based intervention for Brazilian smokers - Viva sem Tabaco.

    Science.gov (United States)

    Gomide, H P; Bernardino, H S; Richter, K; Martins, L F; Ronzani, T M

    2016-08-02

    Web-based interventions for smoking cessation available in Portuguese do not adhere to evidence-based treatment guidelines. Besides, all existing web-based interventions are built on proprietary platforms that developing countries often cannot afford. We aimed to describe the development of "Viva sem Tabaco", an open-source web-based intervention. The development of the intervention included the selection of content from evidence-based guidelines for smoking cessation, the design of the first layout, conduction of 2 focus groups to identify potential features, refinement of the layout based on focus groups and correction of content based on feedback provided by specialists on smoking cessation. At the end, we released the source-code and intervention on the Internet and translated it into Spanish and English. The intervention developed fills gaps in the information available in Portuguese and the lack of open-source interventions for smoking cessation. The open-source licensing format and its translation system may help researchers from different countries deploying evidence-based interventions for smoking cessation.

  15. A high-efficiency electrically-pumped single-photon source based on a photonics nanowire

    DEFF Research Database (Denmark)

    Gregersen, Niels; Nielsen, Torben Roland; Mørk, Jesper

    An electrically-pumped single-photon source design with a predicted efficiency of 89% is proposed. The design is based on a quantum dot embedded in a photonic nanowire with tailored ends and optimized contact electrodes. Unlike cavity-based approaches, the photonic nanowire features broadband...

  16. MR-based source localization for MR-guided HDR brachytherapy

    Science.gov (United States)

    Beld, E.; Moerland, M. A.; Zijlstra, F.; Viergever, M. A.; Lagendijk, J. J. W.; Seevinck, P. R.

    2018-04-01

    For the purpose of MR-guided high-dose-rate (HDR) brachytherapy, a method for real-time localization of an HDR brachytherapy source was developed, which requires high spatial and temporal resolutions. MR-based localization of an HDR source serves two main aims. First, it enables real-time treatment verification by determination of the HDR source positions during treatment. Second, when using a dummy source, MR-based source localization provides an automatic detection of the source dwell positions after catheter insertion, allowing elimination of the catheter reconstruction procedure. Localization of the HDR source was conducted by simulation of the MR artifacts, followed by a phase correlation localization algorithm applied to the MR images and the simulated images, to determine the position of the HDR source in the MR images. To increase the temporal resolution of the MR acquisition, the spatial resolution was decreased, and a subpixel localization operation was introduced. Furthermore, parallel imaging (sensitivity encoding) was applied to further decrease the MR scan time. The localization method was validated by a comparison with CT, and the accuracy and precision were investigated. The results demonstrated that the described method could be used to determine the HDR source position with a high accuracy (0.4–0.6 mm) and a high precision (⩽0.1 mm), at high temporal resolutions (0.15–1.2 s per slice). This would enable real-time treatment verification as well as an automatic detection of the source dwell positions.

  17. Audio Source Separation in Reverberant Environments Using β-Divergence-Based Nonnegative Factorization

    DEFF Research Database (Denmark)

    Fakhry, Mahmoud; Svaizer, Piergiorgio; Omologo, Maurizio

    2017-01-01

    -maximization algorithm and used to separate the signals by means of multichannel Wiener filtering. We propose to estimate these parameters by applying nonnegative factorization based on prior information on source variances. In the nonnegative factorization, spectral basis matrices can be defined as the prior...... information. The matrices can be either extracted or indirectly made available through a redundant library that is trained in advance. In a separate step, applying nonnegative tensor factorization, two algorithms are proposed in order to either extract or detect the basis matrices that best represent......In Gaussian model-based multichannel audio source separation, the likelihood of observed mixtures of source signals is parametrized by source spectral variances and by associated spatial covariance matrices. These parameters are estimated by maximizing the likelihood through an expectation...

  18. Evaluation and selection of open-source EMR software packages based on integrated AHP and TOPSIS.

    Science.gov (United States)

    Zaidan, A A; Zaidan, B B; Al-Haiqi, Ahmed; Kiah, M L M; Hussain, Muzammil; Abdulnabi, Mohamed

    2015-02-01

    Evaluating and selecting software packages that meet the requirements of an organization are difficult aspects of software engineering process. Selecting the wrong open-source EMR software package can be costly and may adversely affect business processes and functioning of the organization. This study aims to evaluate and select open-source EMR software packages based on multi-criteria decision-making. A hands-on study was performed and a set of open-source EMR software packages were implemented locally on separate virtual machines to examine the systems more closely. Several measures as evaluation basis were specified, and the systems were selected based a set of metric outcomes using Integrated Analytic Hierarchy Process (AHP) and TOPSIS. The experimental results showed that GNUmed and OpenEMR software can provide better basis on ranking score records than other open-source EMR software packages. Copyright © 2014 Elsevier Inc. All rights reserved.

  19. Blind Source Separation Based on Covariance Ratio and Artificial Bee Colony Algorithm

    Directory of Open Access Journals (Sweden)

    Lei Chen

    2014-01-01

    Full Text Available The computation amount in blind source separation based on bioinspired intelligence optimization is high. In order to solve this problem, we propose an effective blind source separation algorithm based on the artificial bee colony algorithm. In the proposed algorithm, the covariance ratio of the signals is utilized as the objective function and the artificial bee colony algorithm is used to solve it. The source signal component which is separated out, is then wiped off from mixtures using the deflation method. All the source signals can be recovered successfully by repeating the separation process. Simulation experiments demonstrate that significant improvement of the computation amount and the quality of signal separation is achieved by the proposed algorithm when compared to previous algorithms.

  20. Sketches of a hammer-impact, spiked-base, shear-wave source

    Science.gov (United States)

    Hasbrouck, W.P.

    1983-01-01

    Generation of shear waves in shallow seismic investigations (those to depths usually less than 100 m) can be accomplished by horizontally striking with a hammer either the end of a wood plank or metal structure embedded at the ground surface. The dimensioned sketches of this report are of a steel, hammer-impact, spiked-base, shear-wave source. It has been used on outcrops and in a desert environment and for conducting experiments on the effect of rotating source direction.

  1. Dynamic pricing based on a cloud computing framework to support the integration of renewable energy sources

    OpenAIRE

    Rajeev Thankappan Nair; Ashok Sankar

    2014-01-01

    Integration of renewable energy sources into the electric grid in the domestic sector results in bidirectional energy flow from the supply side of the consumer to the grid. Traditional pricing methods are difficult to implement in such a situation of bidirectional energy flow and they face operational challenges on the application of price-based demand side management programme because of the intermittent characteristics of renewable energy sources. In this study, a dynamic pricing method usi...

  2. Coal-tar-based sealcoated pavement: A major PAH source to urban stream sediments

    International Nuclear Information System (INIS)

    Witter, Amy E.; Nguyen, Minh H.; Baidar, Sunil; Sak, Peter B.

    2014-01-01

    We used land-use analysis, PAH concentrations and assemblages, and multivariate statistics to identify sediment PAH sources in a small (∼1303 km 2 ) urbanizing watershed located in South-Central, Pennsylvania, USA. A geographic information system (GIS) was employed to quantify land-use features that may serve as PAH sources. Urban PAH concentrations were three times higher than rural levels, and were significantly and highly correlated with combined residential/commercial/industrial land use. Principal components analysis (PCA) was used to group sediments with similar PAH assemblages, and correlation analysis compared PAH sediment assemblages to common PAH sources. The strongest correlations were observed between rural sediments (n = 7) and coke-oven emissions sources (r = 0.69–0.78, n = 5), and between urban sediments (n = 22) and coal-tar-based sealcoat dust (r = 0.94, n = 47) suggesting that coal-tar-based sealcoat is an important urban PAH source in this watershed linked to residential and commercial/industrial land use. -- Highlights: • Total PAH concentrations were measured at 35 sites along an urbanizing land-use gradient. • PAH concentrations increased with increasing urban land-use. • Urban land-use metrics were measured at three spatial scales using GIS. • PAH assemblages indicate coal-tar-based sealcoat is a major urban PAH source. • PAH assemblages indicate coke-oven emissions are an important rural PAH source. -- Coal-tar-based sealcoated pavement is a major PAH source to urban freshwater stream sediments in south-central Pennsylvania, USA

  3. Coherent anti-Stokes Raman scattering spectroscope/microscope based on a widely tunable laser source

    Science.gov (United States)

    Dementjev, A.; Gulbinas, V.; Serbenta, A.; Kaucikas, M.; Niaura, G.

    2010-03-01

    We present a coherent anti-Stokes Raman scattering (CARS) microscope based on a robust and simple laser source. A picosecond laser operating in a cavity dumping regime at the 1 MHz repetition rate was used to pump a traveling wave optical parametric generator, which serves as a two-color excitation light source for the CARS microscope. We demonstrate the ability of the presented CARS microscope to measure CARS spectra and images by using several detection schemes.

  4. A nanotube-based field emission x-ray source for microcomputed tomography

    International Nuclear Information System (INIS)

    Zhang, J.; Cheng, Y.; Lee, Y.Z.; Gao, B.; Qiu, Q.; Lin, W.L.; Lalush, D.; Lu, J.P.; Zhou, O.

    2005-01-01

    Microcomputed tomography (micro-CT) is a noninvasive imaging tool commonly used to probe the internal structures of small animals for biomedical research and for the inspection of microelectronics. Here we report the development of a micro-CT scanner with a carbon nanotube- (CNT-) based microfocus x-ray source. The performance of the CNT x-ray source and the imaging capability of the micro-CT scanner were characterized

  5. Analyzing of economic growth based on electricity consumption from different sources

    Science.gov (United States)

    Maksimović, Goran; Milosavljević, Valentina; Ćirković, Bratislav; Milošević, Božidar; Jović, Srđan; Alizamir, Meysam

    2017-10-01

    Economic growth could be influenced by different factors. In this study was analyzed the economic growth based on the electricity consumption form different sources. As economic growth indicator gross domestic product (GDP) was used. ANFIS (adaptive neuro fuzzy inference system) methodology was applied to determine the most important factors from the given set for the GDP growth prediction. Six inputs were used: electricity production from coal, hydroelectric, natural gas, nuclear, oil and renewable sources. Results shown that the electricity consumption from renewable sources has the highest impact on the economic or GDP growth prediction.

  6. GIS-BASED ROUTE FINDING USING ANT COLONY OPTIMIZATION AND URBAN TRAFFIC DATA FROM DIFFERENT SOURCES

    Directory of Open Access Journals (Sweden)

    M. Davoodi

    2015-12-01

    Full Text Available Nowadays traffic data is obtained from multiple sources including GPS, Video Vehicle Detectors (VVD, Automatic Number Plate Recognition (ANPR, Floating Car Data (FCD, VANETs, etc. All such data can be used for route finding. This paper proposes a model for finding the optimum route based on the integration of traffic data from different sources. Ant Colony Optimization is applied in this paper because the concept of this method (movement of ants in a network is similar to urban road network and movements of cars. The results indicate that this model is capable of incorporating data from different sources, which may even be inconsistent.

  7. Outlines on data base for the use of radioactive sources, and environmental impact in egypt

    Energy Technology Data Exchange (ETDEWEB)

    Hathout, A M; Amin, E; El-Said, Kh M [National Center for Nuclear Safety and Radiation Control, AEA Cairo (Egypt); Gomaa, M A [Reactors Division Nuclear Research Center, AEA Cairo, (Egypt)

    1997-12-31

    Radio isotopes and radioactive sources have shown increase applications in scientific research, agriculture, medicine and industry. The prime concern in regulating activities involving the release of radioactive materials into the environment, is ensuring the safety of individuals and population. The management of radioactive wastes generated from medical centers, research institutes, industrial facilities, mining operations, and research reactors caused serious accidents. Radiation sources mismanagement resulted in injuries or fatalities to individuals. The objectives of this work is to develop the required data base and establish the necessary rules for safe management of radioactive sources. 1 fig., 3 tabs.

  8. Gis-Based Route Finding Using ANT Colony Optimization and Urban Traffic Data from Different Sources

    Science.gov (United States)

    Davoodi, M.; Mesgari, M. S.

    2015-12-01

    Nowadays traffic data is obtained from multiple sources including GPS, Video Vehicle Detectors (VVD), Automatic Number Plate Recognition (ANPR), Floating Car Data (FCD), VANETs, etc. All such data can be used for route finding. This paper proposes a model for finding the optimum route based on the integration of traffic data from different sources. Ant Colony Optimization is applied in this paper because the concept of this method (movement of ants in a network) is similar to urban road network and movements of cars. The results indicate that this model is capable of incorporating data from different sources, which may even be inconsistent.

  9. Reciprocity in computer-human interaction: source-based, norm-based, and affect-based explanations.

    Science.gov (United States)

    Lee, Seungcheol Austin; Liang, Yuhua Jake

    2015-04-01

    Individuals often apply social rules when they interact with computers, and this is known as the Computers Are Social Actors (CASA) effect. Following previous work, one approach to understand the mechanism responsible for CASA is to utilize computer agents and have the agents attempt to gain human compliance (e.g., completing a pattern recognition task). The current study focuses on three key factors frequently cited to influence traditional notions of compliance: evaluations toward the source (competence and warmth), normative influence (reciprocity), and affective influence (mood). Structural equation modeling assessed the effects of these factors on human compliance with computer request. The final model shows that norm-based influence (reciprocity) increased the likelihood of compliance, while evaluations toward the computer agent did not significantly influence compliance.

  10. Agent-based power sharing scheme for active hybrid power sources

    Science.gov (United States)

    Jiang, Zhenhua

    The active hybridization technique provides an effective approach to combining the best properties of a heterogeneous set of power sources to achieve higher energy density, power density and fuel efficiency. Active hybrid power sources can be used to power hybrid electric vehicles with selected combinations of internal combustion engines, fuel cells, batteries, and/or supercapacitors. They can be deployed in all-electric ships to build a distributed electric power system. They can also be used in a bulk power system to construct an autonomous distributed energy system. An important aspect in designing an active hybrid power source is to find a suitable control strategy that can manage the active power sharing and take advantage of the inherent scalability and robustness benefits of the hybrid system. This paper presents an agent-based power sharing scheme for active hybrid power sources. To demonstrate the effectiveness of the proposed agent-based power sharing scheme, simulation studies are performed for a hybrid power source that can be used in a solar car as the main propulsion power module. Simulation results clearly indicate that the agent-based control framework is effective to coordinate the various energy sources and manage the power/voltage profiles.

  11. An image-based search for pulsars among Fermi unassociated LAT sources

    Science.gov (United States)

    Frail, D. A.; Ray, P. S.; Mooley, K. P.; Hancock, P.; Burnett, T. H.; Jagannathan, P.; Ferrara, E. C.; Intema, H. T.; de Gasperin, F.; Demorest, P. B.; Stovall, K.; McKinnon, M. M.

    2018-03-01

    We describe an image-based method that uses two radio criteria, compactness, and spectral index, to identify promising pulsar candidates among Fermi Large Area Telescope (LAT) unassociated sources. These criteria are applied to those radio sources from the Giant Metrewave Radio Telescope all-sky survey at 150 MHz (TGSS ADR1) found within the error ellipses of unassociated sources from the 3FGL catalogue and a preliminary source list based on 7 yr of LAT data. After follow-up interferometric observations to identify extended or variable sources, a list of 16 compact, steep-spectrum candidates is generated. An ongoing search for pulsations in these candidates, in gamma rays and radio, has found 6 ms pulsars and one normal pulsar. A comparison of this method with existing selection criteria based on gamma-ray spectral and variability properties suggests that the pulsar discovery space using Fermi may be larger than previously thought. Radio imaging is a hitherto underutilized source selection method that can be used, as with other multiwavelength techniques, in the search for Fermi pulsars.

  12. Transparent mediation-based access to multiple yeast data sources using an ontology driven interface.

    Science.gov (United States)

    Briache, Abdelaali; Marrakchi, Kamar; Kerzazi, Amine; Navas-Delgado, Ismael; Rossi Hassani, Badr D; Lairini, Khalid; Aldana-Montes, José F

    2012-01-25

    Saccharomyces cerevisiae is recognized as a model system representing a simple eukaryote whose genome can be easily manipulated. Information solicited by scientists on its biological entities (Proteins, Genes, RNAs...) is scattered within several data sources like SGD, Yeastract, CYGD-MIPS, BioGrid, PhosphoGrid, etc. Because of the heterogeneity of these sources, querying them separately and then manually combining the returned results is a complex and time-consuming task for biologists most of whom are not bioinformatics expert. It also reduces and limits the use that can be made on the available data. To provide transparent and simultaneous access to yeast sources, we have developed YeastMed: an XML and mediator-based system. In this paper, we present our approach in developing this system which takes advantage of SB-KOM to perform the query transformation needed and a set of Data Services to reach the integrated data sources. The system is composed of a set of modules that depend heavily on XML and Semantic Web technologies. User queries are expressed in terms of a domain ontology through a simple form-based web interface. YeastMed is the first mediation-based system specific for integrating yeast data sources. It was conceived mainly to help biologists to find simultaneously relevant data from multiple data sources. It has a biologist-friendly interface easy to use. The system is available at http://www.khaos.uma.es/yeastmed/.

  13. Set of instruments for solar EUV and soft X-ray monitoring onboard satellite Coronas-Photon

    Science.gov (United States)

    Kotov, Yury; Kochemasov, Alexey; Kuzin, Sergey; Kuznetsov, Vladimir; Sylwester, Janusz; Yurov, Vitaly

    Coronas-Photon mission is the third satellite of the Russian Coronas program on solar activity observation. The main goal of the "Coronas-Photon" is the study of solar hard electromagnetic radiation in the wide energy range from UV up to high energy gamma-radiation (2000MeV). Scientific payload for solar radiation observation consists of three types of instruments: Monitors (Natalya-2M, Konus-RF, RT-2, Penguin-M, BRM, PHOKA, Sphin-X, SOKOL spectral and timing measurements of full solar disk radiation have timing in flare/burst mode up to one msec. Instruments Natalya-2M, Konus-RF, RT-2 will cover the wide energy range of hard X-rays and soft gamma-rays (15keV to 2000MeV) and will together constitute the largest area detectors ever used for solar observations. Detectors of gamma-ray monitors are based on structured inorganic scintillators. For X-ray and EUV monitors the scintillation phoswich detectors, gas proportional counter, CdZnTe assembly and filter-covered Si-diodes are used. Telescope-spectrometer TESIS for imaging solar spectroscopy in X-rays has angular resolution up to 1arcsec in three spectral lines. Satellite platform and scientific payload is under construction to be launched in autumn 2008. Satellite orbit is circular with initial height 550km and inclination 82.5degrees. Accuracy of the spacecraft orientation to the Sun is better 3arcmin. In the report the capability of PHOKA, SphinX, SOKOL and TESIS as well as the observation program are described and discussed.

  14. Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

    Science.gov (United States)

    De Simone, Danilo; Mao, Ming; Kocsis, Michael; De Schepper, Peter; Lazzarino, Frederic; Vandenberghe, Geert; Stowers, Jason; Meyers, Stephen; Clark, Benjamin L.; Grenville, Andrew; Luong, Vinh; Yamashita, Fumiko; Parnell, Doni

    2016-03-01

    Inpria has developed a directly patternable metal oxide hard-mask as a robust, high-resolution photoresist for EUV lithography. In this paper we demonstrate the full integration of a baseline Inpria resist into an imec N7 BEOL block mask process module. We examine in detail both the lithography and etch patterning results. By leveraging the high differential etch resistance of metal oxide photoresists, we explore opportunities for process simplification and cost reduction. We review the imaging results from the imec N7 block mask patterns and its process windows as well as routes to maximize the process latitude, underlayer integration, etch transfer, cross sections, etch equipment integration from cross metal contamination standpoint and selective resist strip process. Finally, initial results from a higher sensitivity Inpria resist are also reported. A dose to size of 19 mJ/cm2 was achieved to print pillars as small as 21nm.

  15. Beam-foil study of neon in the EUV with foils of carbon, silver and gold

    International Nuclear Information System (INIS)

    Demarest, J.A.; Watson, R.L.; Texas A and M Univ., College Station

    1988-01-01

    A beam-foil study of 40 MeV neon was conducted in the EUV with a 1-meter grazing incidence spectrometer configured with a position sensitive microchannel plate detector. A number of new lines of Ne IX, mainly from transitions to n = 3 levels, were detected in the wavelength region covering 50-350 A. Comparison of the spectra obtained using the different foils revealed that the average charge state of the neon projectiles was nearly one unit higher with carbon than with either of the two metals. Measurements of line intensities versus distance from the foils showed that cascade contributions were greatly reduced for the metals. It was also found that n = 3 states of low l were overpopulated relative to a statistical distribution, irrespective of the foil material. (orig.)

  16. Development of high power pumping system for capillary discharge EUV laser

    International Nuclear Information System (INIS)

    Sakai, Yusuke; Komatsu, Takanori; Watanabe, Masato; Okino, Akitoshi; Hotta, Eiki

    2008-01-01

    Development of high power pumping system for capillary discharge soft X-ray laser is reported. The pulsed power system consists of a 2.2 μF LC generator, a 2:54 step-up transformer and a 3 nF water capacitor. Taking advantage of high efficiency configuration, step-up ratio of water capacitor voltage to LC generator initial voltage is about 40 times. Consequently, obtained water capacitor voltage reaches about 450 kV when LC generator was charged to 12.5 kV. As a consequent, possibility of charging a water capacitor to 1 MV is demonstrated. With this extremely compact system, discharge current could be increased to nearly 100 kA through moderately long capillary, which leads to generation of high-density and high-temperature plasma column in order to realize EUV laser. (author)

  17. Impulsive EUV bursts observed in C IV with OSO-8. [UV solar spectra

    Science.gov (United States)

    Athay, R. G.; White, O. R.; Lites, B. W.; Bruner, E. C., Jr.

    1980-01-01

    Time sequences of profiles of the 1548 A line of C IV containing 51 EUV bursts observed in or near active regions are analyzed to determine the brightness, Doppler shift and line broadening characteristics of the bursts. The bursts have mean lifetimes of approximately 150 s, and mean increases in brightness at burst maximum of four-fold as observed with a field of view of 2 x 20 arc sec. Mean burst diameters are estimated to be 3 arc sec, or smaller. All but three of the bursts show Doppler shifts with velocities sometimes exceeding 75 km/s; 31 are dominated by red shifts and 17 are dominated by blue shifts. Approximately half of the latter group have red-shifted precursors. The bursts are interpreted as prominence material, such as surges and coronal rain, moving through the field of view of the spectrometer.

  18. The High-Resolution Lightweight Telescope for the EUV (HiLiTE)

    Energy Technology Data Exchange (ETDEWEB)

    Martinez-Galarce, D S; Boerner, P; Soufli, R; De Pontieu, B; Katz, N; Title, A; Gullikson, E M; Robinson, J C; Baker, S L

    2008-06-02

    The High-resolution Lightweight Telescope for the EUV (HiLiTE) is a Cassegrain telescope that will be made entirely of Silicon Carbide (SiC), optical substrates and metering structure alike. Using multilayer coatings, this instrument will be tuned to operate at the 465 {angstrom} Ne VII emission line, formed in solar transition region plasma at {approx}500,000 K. HiLiTE will have an aperture of 30 cm, angular resolution of {approx}0.2 arc seconds and operate at a cadence of {approx}5 seconds or less, having a mass that is about 1/4 that of one of the 20 cm aperture telescopes on the Atmospheric Imaging Assembly (AIA) instrument aboard NASA's Solar Dynamics Observatory (SDO). This new instrument technology thus serves as a path finder to a post-AIA, Explorer-class missions.

  19. Ultra-broadband ptychography with self-consistent coherence estimation from a high harmonic source

    Science.gov (United States)

    Odstrčil, M.; Baksh, P.; Kim, H.; Boden, S. A.; Brocklesby, W. S.; Frey, J. G.

    2015-09-01

    With the aim of improving imaging using table-top extreme ultraviolet sources, we demonstrate coherent diffraction imaging (CDI) with relative bandwidth of 20%. The coherence properties of the illumination probe are identified using the same imaging setup. The presented methods allows for the use of fewer monochromating optics, obtaining higher flux at the sample and thus reach higher resolution or shorter exposure time. This is important in the case of ptychography when a large number of diffraction patterns need to be collected. Our microscopy setup was tested on a reconstruction of an extended sample to show the quality of the reconstruction. We show that high harmonic generation based EUV tabletop microscope can provide reconstruction of samples with a large field of view and high resolution without additional prior knowledge about the sample or illumination.

  20. Preliminary result on quantitative analysis using Zn-like tungsten EUV spectrum in Large Helical Device

    International Nuclear Information System (INIS)

    Morita, Shigeru; Dong, Chunfeng; Wang, Erhui

    2013-01-01

    Tungsten study through visible, vacuum ultraviolet (VUV) and extreme ultraviolet (EUV) spectroscopy has been recently started in Large Helical Device (LHD) for developing the diagnostic method in International Thermonuclear Experimental Reactor (ITER) and understanding the tungsten transport in helical system. In order to study the tungsten spectra from core plasmas of LHD, several tungsten spectra are observed in EUV range by injecting a carbon pellet with tungsten. Zn-like tungsten spectrum with 4p-4s transition is clearly identified at 60.9Å in high-temperature phase (T_e ≥ 2.3 keV) of NBI discharges in addition to several unresolved transition arrays with 6g-4f, 5g-4f, 5f-4d, 5g-4f, 4f-4d and 4d-4p transitions in range of 10-70Å. Radial profile of the Zn-like tungsten is also successfully observed with enough intensity in order of 10"1"6 photons.cm"-"2.s"-"1. The radial emissivity profile reconstructed from the chord-integrated intensity profile is analyzed with combination of HULLAC code for emission coefficient calculation of the Zn-like transition and impurity transport code included ADPAK code for calculation of ionization and recombination rate coefficients. Thus, a total tungsten ion density of 3.5x10"1"0 cm"-"3 at the plasma center is reasonably obtained in discharge with central electron density of 4x10"1"3 cm"-"3 as the first experimental trial. The present result demonstrates that the Zn-like 4p-4s transition is applicable to the tungsten diagnostics in high-temperature plasmas. (author)