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Sample records for epitaxial gan layer

  1. GaN epitaxial layers prepared on nano-patterned Si(001) substrate.

    Science.gov (United States)

    Huang, C C; Chang, S J; Kuo, C H; Ko, C H; Wann, Clement H; Cheng, Y C; Lin, W J

    2011-02-01

    We report the growth of GaN epitaxial layer on Si(001) substrate with nano-patterns prepared by dry etching facility used in integrated circuit (IC) industry. It was found that the GaN epitaxial layer prepared on nano-patterned Si(001) substrate exhibits both cubic and hexagonal phases. It was also found that threading dislocation observed from GaN prepared on nano-patterned Si(001) substrate was significantly smaller than that prepared on conventional unpatterned Si(111) substrate. Furthermore, it was found that we can reduce the tensile stress in GaN epitaxial layer by about 78% using the nano-patterned Si(001) substrate.

  2. Anelasticity of GaN Epitaxial Layer in GaN LED

    Science.gov (United States)

    Chung, C. C.; Yang, C. T.; Liu, C. Y.

    2016-10-01

    In this work, the anelasticity of the GaN layer in the GaN light-emitting-diode device was studied. The present results show that the forward-voltage of GaN LED increases with time, as the GaN light-emitting-diode was maintained at a constant temperature of 100 °C. We found that the increase of the forward-voltage with time attributes to the delay-response of the piezoelectric fields (internal electrical fields in GaN LED device). And, the delay-response of the internal electrical fields with time is caused by the anelasticity (time-dependent strain) of the GaN layer. Therefore, using the correlation of strain-piezoelectric-forward voltage, a plot of thermal strain of the GaN layer against time can be obtained by measuring the forward-voltage of the studied GaN LED against time. With the curves of the thermal strain of GaN epi-layers versus time, the anelasticity of the GaN compound can be studied. The key anelasticity parameter, characteristic relaxation time, of the GaN is defined to be 2623.76 min in this work.

  3. Occurrence of cubic GaN and strain relaxation in GaN buffer layers grown by low-pressure metalorganic vapor phase epitaxy on (0001) sapphire substrates

    Science.gov (United States)

    Cheng, Lisen; Zhou, Kuan; Zhang, Ze; Zhang, Guoyi; Yang, Zhijian; Tong, Yuzhen

    1999-02-01

    Investigations on GaN buffer layers grown by low-pressure metalorganic vapor phase epitaxy on (0001) sapphire substrates indicated that the mechanisms by way of which GaN buffer layers relax stresses introduced by the lattice mismatch and thermal expansion coefficient difference between GaN epilayer and sapphire substrate are related to both the crystallographic structure of GaN and thickness of the buffer layers. Beside forming misfit dislocations, mismatch-induced stresses can also be relaxed by forming stacking faults and microtwin boundaries parallel to (11-1) of GaN near the interface between GaN and sapphire substrate in cubic GaN buffer layers. It was found that, in cubic GaN buffer layers, there exists a critical thickness within which the stacking faults and/or microtwin boundaries parallel to (11-1) of GaN can be formed. This critical value is determined to be 50 nm.

  4. Maskless epitaxial lateral overgrowth of GaN layers on structured Si(111) substrates

    Science.gov (United States)

    Strittmatter, A.; Rodt, S.; Reißmann, L.; Bimberg, D.; Schröder, H.; Obermeier, E.; Riemann, T.; Christen, J.; Krost, A.

    2001-02-01

    GaN layers are laterally overgrown by metalorganic chemical vapor deposition on structured Si(111) substrates in a single growth process. The substrates are structured with parallel grooves along the Si or perpendicular to the Si direction by standard photolithography and subsequent dry etching. Due to the anisotropic chemical dry etch process, the remaining Si ridges are underetched. The GaN layer grows nearly exclusively on the bottom of the grooves and on the top of the ridges between the grooves. These two growth fronts are completely separated from each other. As a consequence, the GaN layer growing from the ridge area between grooves can extend over the grooves. This process is similar to the so called pendeo-epitaxy process, but is completely mask free during growth and does not require any growth interruption. The improvement of the crystalline and the optical quality of the GaN layer is demonstrated by atomic force microscopy and cathodoluminescence spectroscopy.

  5. Synchrotron X-ray diffraction analysis of epitaxial GaN layer laterally overgrown

    CERN Document Server

    Feng Gan; Wang Yu Tian; Yang Hui; Liang Jun Wu; Zheng Wen Li; Jia Quan Jie

    2002-01-01

    The GaN layer grown by epitaxial lateral overgrowth on sapphire (0001) has been investigated by synchrotron X-ray diffraction. The results show that ELO GaN stripes bend towards the SiN sub x mask in directions perpendicular to the stripe direction. This lead to the GaN (0001) crystal planes in the 'wings' (overgrown GaN) exhibit crystallographic tilts away from those in the 'window' (seed) regions. The GaN (0002) diffraction was used to determine the grain sizes in the wing region and window region, respectively. It is found that the grain size in the wing region increases about three times comparing to those in window region

  6. Effects of the surface stoichiometry of seeds on GaN layer growth by hydride vapour phase epitaxy.

    Science.gov (United States)

    Wang, B; Zhao, Z D; Xu, W; Sui, Y P; Yu, G H

    2015-05-07

    The effect of the atmosphere in a reactor prior to hydride vapour phase epitaxy on the surface stoichiometry of both the GaN template and layer growth was studied. The surface stoichiometry of metallic Ga layers was clarified by X-ray photoelectron spectroscopy using templates without NH3 protection. The metallic Ga layer acted as a mask and exerted a significant effect on the subsequent epitaxial layer growth mode. GaN grown on the template without protection followed island growth in the initial growth stage. In contrast, GaN epitaxy on the template with NH3 protection quickly converts to pseudo-2D growth. The images of CL illustrate that the GaN epilayer on the template without protection has a lower dislocation density than the GaN epilayer grown on the template with NH3 protection. Reasons behind this effect have been discussed.

  7. Structural properties of cubic GaN epitaxial layers grown on β-SiC

    Science.gov (United States)

    Teles, L. K.; Scolfaro, L. M. R.; Enderlein, R.; Leite, J. R.; Josiek, A.; Schikora, D.; Lischka, K.

    1996-12-01

    Self-consistent tight-binding total energy calculations are performed to study the deposition of a few layers of cubic GaN on (100) β-SiC substrates. Cohesion energies, atomic displacements, dangling bond occupancies and surface reconstructions are calculated for a variety of epitaxial systems including monolayers of either Ga or N as well as single and double bilayers of GaN on either Si or C terminated substrates. The SiC substrates and Ga-N epitaxial layers are represented by 2×2 supercells of 9 Si and C monolayers plus the respective number of monolayers of Ga and N atoms. Depending on the system, surface atoms dimerize either symmetrically or asymmetrically resulting in either 2×1, c-2×2, or 2×2 surface reconstructions. At the substrate-epitaxial-layer interfaces, N binds stronger than Ga to either Si or C. Interface mixing is found to be energetically not advantageous for both C- and Si-terminated substrates, although for the latter the obtained small energy differences may suggest the possibility of mixing.

  8. Comparative Raman studies of cubic and hexagonal GaN epitaxial layers

    Science.gov (United States)

    Tabata, A.; Enderlein, R.; Leite, J. R.; da Silva, S. W.; Galzerani, J. C.; Schikora, D.; Kloidt, M.; Lischka, K.

    1996-04-01

    Hexagonal and cubic GaN layers are grown on (001) GaAs substrates by means of molecular beam epitaxy. First order Raman spectra are taken from these layers at various incident laser wavelengths and temperatures. The T2 transverse-optical (TO) and longitudinal-optical (LO) frequencies of cubic GaN are determined, as well as the A1 TO and LO, E1 TO, and E2 frequencies of hexagonal GaN. The T2 TO frequency of cubic GaN lies between the A1 and E1 TO frequencies of hexagonal GaN as one expects comparing the lattice dynamics of zincblende and wurtzite type crystals. The T2 TO frequency is close to the calculated value but disagrees with a recently reported experimental value. For the hexagonal layer, all frequencies are close to those previously measured. A broad Raman structure below the A1 LO peak is interpreted in terms of a disturbed long range order of the hexagonal layer.

  9. Infrared Reflectance Analysis of Epitaxial n-Type Doped GaN Layers Grown on Sapphire

    Science.gov (United States)

    Tsykaniuk, Bogdan I.; Nikolenko, Andrii S.; Strelchuk, Viktor V.; Naseka, Viktor M.; Mazur, Yuriy I.; Ware, Morgan E.; DeCuir, Eric A.; Sadovyi, Bogdan; Weyher, Jan L.; Jakiela, Rafal; Salamo, Gregory J.; Belyaev, Alexander E.

    2017-06-01

    Infrared (IR) reflectance spectroscopy is applied to study Si-doped multilayer n+/n0/n+-GaN structure grown on GaN buffer with GaN-template/sapphire substrate. Analysis of the investigated structure by photo-etching, SEM, and SIMS methods showed the existence of the additional layer with the drastic difference in Si and O doping levels and located between the epitaxial GaN buffer and template. Simulation of the experimental reflectivity spectra was performed in a wide frequency range. It is shown that the modeling of IR reflectance spectrum using 2 × 2 transfer matrix method and including into analysis the additional layer make it possible to obtain the best fitting of the experimental spectrum, which follows in the evaluation of GaN layer thicknesses which are in good agreement with the SEM and SIMS data. Spectral dependence of plasmon-LO-phonon coupled modes for each GaN layer is obtained from the spectral dependence of dielectric of Si doping impurity, which is attributed to compensation effects by the acceptor states.

  10. Improvement of structural properties of GaN Pendeo-epitaxial Layers

    Energy Technology Data Exchange (ETDEWEB)

    Cheong, Hung-Seob; Hong, Young-Kue; Hong, Chang-Hee; Jae Lee, Hyung [Department of Semiconductor Science and Technology and Semiconductor Physics Research Center, Chonbuk National University, Duckjin-Dong, Duckjin-ku, Chonju 561-756 (Korea); Choi, Yoon-Ho; Leem, Shi-Jong [Department of OE Team, Device and Materials Laboratory, LG Electronics Institute of Technology, Seoul 137-724 (Korea)

    2002-08-16

    The effects of growth parameters on growth behavior of Pendeo-epitaxial GaN layers in left angle 1 anti 1 right angle patterned GaN seed stripes on sapphire were systematically investigated to improve the structural properties of the overgrown layers. It was found that the ratio of lateral to vertical growth rate ({gamma}) is strongly affected by changes in growth temperature, reactor pressure, and V/III ratio, which have an effect on the distribution of crystallographic tilt among the wing regions. Also, the crystallographic anisotropy, which was determined from the results of (0002) X-ray diffraction rocking curves taken perpendicular and parallel to the seed stripe direction, can be improved with relatively high V/III ratio. (Abstract Copyright[2002], Wiley Periodicals, Inc.)

  11. Investigation of InN layers grown by molecular beam epitaxy on GaN templates

    Energy Technology Data Exchange (ETDEWEB)

    Vilalta-Clemente, A.; Mutta, G.R.; Chauvat, M.P.; Morales, M.; Doualan, J.L.; Ruterana, P. [CIMAP UMR 6252 CNRS-ENSICAEN-CEA-UCBN, Caen (France); Grandal, J.; Sanchez-Garcia, M.A.; Calle, F. [ISOM y Department de Ingenieria Electronica, E.T.S.I. Telecomunicacion, Universidad Politecnica de Madrid, Ciudad Universitaria (Spain); Valcheva, E.; Kirilov, K. [Faculty of Physics, Sofia University (Bulgaria)

    2010-05-15

    An investigation of InN layers grown on GaN templates by molecular beam epitaxy (MBE) has been carried out by X-ray diffraction (XRD), Raman spectroscopy (RS) and photoluminescence (PL). A good correlation is noticed between their crystalline quality and optical properties. The best samples exhibit a PL emission between 0.6 and 0.7 eV. The surface structure was quite different from one sample to the other, pointing out to a critical role of the growth conditions, which probably need to be tightly optimized for a good reproducibility. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  12. Successful Fabrication of GaN Epitaxial Layer on Non-Catalytically grown Graphene

    Energy Technology Data Exchange (ETDEWEB)

    Hwang, Sung Won [Konkuk University, Chungju (Korea, Republic of); Choi, Suk-Ho [Kyung Hee University, Yongin (Korea, Republic of)

    2016-07-15

    Sapphire is widely used as a substrate for the growth of GaN epitaxial layer (EPI), but has several drawbacks such as high cost, large lattice mismatch, non-flexibility, and so on. Here, we first employ graphene directly grown on Si or sapphire substrate as a platform for the growth and lift-off of GaN-light-emitting diode (LED) EPI, useful for not only recycling the substrate but also transferring the GaN-LED EPI to other flexible substrates. Sequential standard processes of nucleation/recrystallization of GaN seeds and deposition of undoped (u-) GaN/AlN buffer layer were done on graphene/substrate before the growth of GaN-LED EPI, accompanied by taping and lift-off of u-GaN/AlN or GaN-LED EPI. This approach can overcome the limitations by the catalytic growth and transfer of graphene, and make the oxygen-plasma treatment of graphene for the growth of GaN EPI unnecessary.

  13. Epitaxial Single-Layer MoS2 on GaN with Enhanced Valley Helicity

    KAUST Repository

    Wan, Yi

    2017-12-19

    Engineering the substrate of 2D transition metal dichalcogenides can couple the quasiparticle interaction between the 2D material and substrate, providing an additional route to realize conceptual quantum phenomena and novel device functionalities, such as realization of a 12-time increased valley spitting in single-layer WSe2 through the interfacial magnetic exchange field from a ferromagnetic EuS substrate, and band-to-band tunnel field-effect transistors with a subthreshold swing below 60 mV dec−1 at room temperature based on bilayer n-MoS2 and heavily doped p-germanium, etc. Here, it is demonstrated that epitaxially grown single-layer MoS2 on a lattice-matched GaN substrate, possessing a type-I band alignment, exhibits strong substrate-induced interactions. The phonons in GaN quickly dissipate the energy of photogenerated carriers through electron–phonon interaction, resulting in a short exciton lifetime in the MoS2/GaN heterostructure. This interaction enables an enhanced valley helicity at room temperature (0.33 ± 0.05) observed in both steady-state and time-resolved circularly polarized photoluminescence measurements. The findings highlight the importance of substrate engineering for modulating the intrinsic valley carriers in ultrathin 2D materials and potentially open new paths for valleytronics and valley-optoelectronic device applications.

  14. Growth of Ga- and N-polar GaN layers on O face ZnO substrates by molecular beam epitaxy

    Science.gov (United States)

    Xia, Y.; Brault, J.; Vennéguès, P.; Nemoz, M.; Teisseire, M.; Leroux, M.; Chauveau, J.-M.

    2014-02-01

    Gallium nitride (GaN) epitaxial layers have been grown on O face (0001bar) zinc oxide (ZnO) substrates by ammonia source molecular beam epitaxy. By adjusting the growth temperature and the III/V ratio during the nucleation stage, GaN layers with Ga (0001) or N (0001bar) polarities have been obtained. We show that low growth temperatures (600 °C) and N-rich conditions lead to N-polar layers. Furthermore, the formation of a zinc gallate (ZnGa2O4) interfacial layer between GaN and ZnO has been evidenced, which is responsible for the growth of Ga-polar GaN layers. The structural and optical properties of Ga- and N-polar GaN layers have been characterized and Ga-polar GaN layers exhibit higher crystal quality.

  15. Use of hydrogen etching to remove existing dislocations in GaN epitaxial layers

    Science.gov (United States)

    Yeh, Yen-Hsien; Chu, Chung-Ming; Wu, Yin-Hao; Hsu, Ying-Chia; Yu, Tzu-Yi; Lee, Wei-I.

    2015-08-01

    In this paper, based on the anisotropic nature of hydrogen (H2) etching on GaN, we describe a new approach to the removal of threading dislocations in GaN layers. The top surfaces of c-plane (Ga-face) and a-plane GaNs are considered stable in H2; therefore, H2 etches only crystal imperfections such as dislocation and basal plane stacking fault (BSF) sites. We used H2 to etch undoped c-plane GaN, n-type c-plane GaN, a-plane GaN, and an InGaN/GaN multiple quantum well structure. Several examinations were performed, indicating deep cavities on the c-plane GaN samples after H2 etching; furthermore, gorge-like grooves were observed on the a-plane GaN samples. The deep cavities on the c-plane GaN were considered the etched dislocation sites, and the gorge-like grooves on the a-plane GaN were considered the etched BSF sites. Photoluminescence measurements were performed and the results indicated that the H2-etched samples demonstrate superior optoelectronic properties, probably because of the elimination of dislocations.

  16. Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs.

    Science.gov (United States)

    Shih, Huan-Yu; Shiojiri, Makoto; Chen, Ching-Hsiang; Yu, Sheng-Fu; Ko, Chung-Ting; Yang, Jer-Ren; Lin, Ray-Ming; Chen, Miin-Jang

    2015-09-02

    High threading dislocation (TD) density in GaN-based devices is a long unresolved problem because of the large lattice mismatch between GaN and the substrate, which causes a major obstacle for the further improvement of next-generation high-efficiency solid-state lighting and high-power electronics. Here, we report InGaN/GaN LEDs with ultralow TD density and improved efficiency on a sapphire substrate, on which a near strain-free GaN compliant buffer layer was grown by remote plasma atomic layer deposition. This "compliant" buffer layer is capable of relaxing strain due to the absorption of misfit dislocations in a region within ~10 nm from the interface, leading to a high-quality overlying GaN epilayer with an unusual TD density as low as 2.2 × 10(5) cm(-2). In addition, this GaN compliant buffer layer exhibits excellent uniformity up to a 6" wafer, revealing a promising means to realize large-area GaN hetero-epitaxy for efficient LEDs and high-power transistors.

  17. Strain and crystalline defects in epitaxial GaN layers studied by high-resolution X-ray diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Chierchia, Rosa

    2007-07-01

    This thesis treats strain and dislocations in MOVPE GaN layers. The mosaic structure of metalorganic vapour phase epitaxy (MOVPE)-grown GaN layers was studied in dependence on the grain diameter utilizing high-resolution XRD. Different models for the defect structure were analyzed, the edge type TD densities were calculated under the assumption that the dislocations are not randomly distributed but localized at the grain boundaries. Moreover, in situ measurements have shown that the layers are under tension in the c-plane when a nucleation layer is used. The second part of this thesis treats a particular approach to reduce dislocations in MOVPE GaN layers, i.e. maskless pendeo epitaxial growth of MOVPE GAN layers. FE simulations assuming the strain to be completely induced during cooling of the structures after growth agree only partly with experimental data. The strain state of single layers and stripes of GaN grown on SiC was studied to exploit the evolution of the strain in the different phases of the PE growth. The biaxial compressive stress, due to the lattice mismatch between the GaN layer and the AlN nucleation layer is plastically relieved before overgrowth. Temperature dependent measurements show a linear reduction of the wing tilt with increasing temperature varying from sample to sample. Bent TDs have been observed in TEM images of maskless PE samples. Stress induced from the mismatch between the AlN buffer layer and the GaN also contributes to the remaining part of the wing tilt not relieved thermally. It has to be noted that the rest tilt value varies from sample to sample at the growth temperature. In fact some of the data indicate that the wing tilt decreases with increasing V/III ratio. In the last Chapter the application of X-ray techniques for the analysis of strain and composition in layers of inhomogeneous composition is explored. In the first part of the Chapter the strain state and the Al content of AlGaN buffer layers grown directly on (0001

  18. TEM studies of GaN layers grown in non-polar direction: Laterally overgrown and pendeo-epitaxial layers

    Science.gov (United States)

    Liliental-Weber, Z.

    2008-08-01

    The formation of structural defects in GaN grown in non-polar directions is reviewed based on transmission electron microscopy (TEM) studies. Stacking faults (SFs) formed on c-planes and also on prismatic planes bounded by partial dislocations, in addition to full dislocations, are major defects in these layers. Since c-planes are arranged perpendicular to the substrate, these defects propagate to the sample surface through the active areas of the devices and become detrimental for device applications. An established method to decrease the defect density is lateral epitaxial overgrowth (LEO) and pendeo-epitaxy. The measured density of SFs in the seed areas is ˜1.3×10 6 cm -1and in the 'wing' areas ˜1.2×10 4 cm -1; a decrease of almost of two orders of magnitude. For overgrown samples, two opposite wings grow in opposite polar directions: [0 0 0 1] (Ga-growth polarity) and [0 0 0 1] (N-growth polarity) confirmed by convergent beam electron diffraction. Ga-polar wings are wider and often have different height than those grown with N-polarity, therefore planarity of these layers and cracking at the meeting front of two wings often occur. It is shown that two-step growth using MOCVD leads to satisfactory layer planarity.

  19. Microstructure of GaN layers grown on (001) GaAs by plasma assisted molecular-beam epitaxy

    Science.gov (United States)

    Ruvimov, Sergei; Liliental-Weber, Zuzanna; Washburn, Jack; Drummond, Timothy J.; Hafich, Michael; Lee, Stephen R.

    1997-11-01

    High resolution electron microscopy has been applied to characterize the structure of β-GaN epilayers grown on (001) GaAs substrates by plasma-assisted molecular-beam epitaxy. An rf plasma source was used to promote chemically active nitrogen. An exposure of the layer surface to the As flux during the growth of the first few monolayers was shown to result in remarkably flat GaN-GaAs interface. The best quality GaN layers were achieved by near-stoichiometric nucleation with optimal Ga-to-N ratio. Deviation from these nucleation conditions leads to interface roughening and formation of the wurtzite phase within the GaN layer. All the layers contained a high density of stacking faults near the interface which sharply decreases toward the surface. Stacking faults were anisotropically distributed within the GaN layer probably due to different properties of α compared to β dislocations in cubic GaN. The majority of stacking faults intersect the interface along lines parallel to the major flat of the GaAs wafer. The stacking faults are often associated with atomic steps at the GaN-GaAs interface.

  20. Effect of the Ammonia Flow on the Formation of Microstructure Defects in GaN Layers Grown by High-Temperature Vapor Phase Epitaxy

    Science.gov (United States)

    Barchuk, M.; Lukin, G.; Zimmermann, F.; Röder, C.; Motylenko, M.; Pätzold, O.; Heitmann, J.; Kortus, J.; Rafaja, D.

    2017-03-01

    High-temperature vapor phase epitaxy (HTVPE) is a physical vapor transport technology for a deposition of gallium nitride (GaN) layers. However, little is known about the influence of the deposition parameters on the microstructure of the layers. In order to fill this gap, the influence of the ammonia (NH3) flow applied during the HTVPE growth on the microstructure of the deposited GaN layers is investigated in this work. Although the HTVPE technology is intended to grow GaN layers on foreign substrates, the GaN layers under study were grown on GaN templates produced by metal organic vapor phase epitaxy in order to be able to separate the growth defects from the defects induced by the lattice misfit between the foreign substrate and the GaN layer. The microstructure of the layers is characterized by means of high-resolution x-ray diffraction (XRD), transmission electron microscopy and photoluminescence. In samples deposited at low ammonia flow, planar defects were detected, along which the nitrogen atoms are found to be substituted by impurity atoms. The interplay between these planar defects and the threading dislocations is discussed. A combination of XRD and micro-Raman spectroscopy reveals the presence of compressive residual stress in the samples.

  1. Characterization of Stress Relaxation, Dislocations and Crystallographic Tilt Via X-ray Microdiffraction in GaN (0001) Layers Grown by Maskless Pendeo-Epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Barabash, R.I.; Ice, G.E.; Liu, W.; Einfeldt, S.; Hommel, D.; Roskowski, A.M.; Davis, R.F. (ORNL)

    2010-06-25

    Intrinsic stresses due to lattice mismatch and high densities of threading dislocations and extrinsic stresses resulting from the mismatch in the coefficients of thermal expansion are present in almost all III-Nitride heterostructures. Stress relaxation in the GaN layers occurs in conventional and in pendeo-epitaxial films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. Polychromatic X-ray microdiffraction, high resolution monochromatic X-ray diffraction and finite element simulations have been used to determine the distribution of strain, dislocations, sub-boundaries and crystallographic wing tilt in uncoalesced and coalesced GaN layers grown by maskless pendeo-epitaxy. An important parameter was the width-to-height ratio of the etched columns of GaN from which the lateral growth of the wings occurred. The strain and tilt across the stripes increased with the width-to-height ratio. Tilt boundaries formed in the uncoalesced GaN layers at the column/wing interfaces for samples with a large ratio. Sharper tilt boundaries were observed at the interfaces formed by the coalescence of two laterally growing wings. The wings tilted upward during cooling to room temperature for both the uncoalesced and the coalesced GaN layers. It was determined that finite element simulations that account for extrinsic stress relaxation can explain the experimental results for uncoalesced GaN layers. Relaxation of both extrinsic and intrinsic stress components in the coalesced GaN layers contribute to the observed wing tilt and the formation of sub-boundaries.

  2. Characterization of Stress Relaxation, Dislocations and Crystallographic Tilt Via X-ray Microdiffraction in GaN (0001) Layers Grown by Maskless Pendeo-Epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Barabash, Rozaliya [ORNL; Ice, Gene E [ORNL; Liu, Wenjun [ORNL; Einfeldt, S. [University of Bremen, Bremen, Germany; Hommel, D. [University of Bremen, Bremen, Germany; Roskowski, A. M. [North Carolina State University; Davis, R. F. [North Carolina State University

    2005-01-01

    Intrinsic stresses due to lattice mismatch and high densities of threading dislocations and extrinsic stresses resulting from the mismatch in the coefficients of thermal expansion are present in almost all III-Nitride heterostructures. Stress relaxation in the GaN layers occurs in conventional and in pendeo-epitaxial films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. Polychromatic X-ray microdiffraction, high resolution monochromatic X-ray diffraction and finite element simulations have been used to determine the distribution of strain, dislocations, sub-boundaries and crystallographic wing tilt in uncoalesced and coalesced GaN layers grown by maskless pendeo-epitaxy. An important parameter was the width-to-height ratio of the etched columns of GaN from which the lateral growth of the wings occurred. The strain and tilt across the stripes increased with the width-to-height ratio. Tilt boundaries formed in the uncoalesced GaN layers at the column/wing interfaces for samples with a large ratio. Sharper tilt boundaries were observed at the interfaces formed by the coalescence of two laterally growing wings. The wings tilted upward during cooling to room temperature for both the uncoalesced and the coalesced GaN layers. It was determined that finite element simulations that account for extrinsic stress relaxation can explain the experimental results for uncoalesced GaN layers. Relaxation of both extrinsic and intrinsic stress components in the coalesced GaN layers contribute to the observed wing tilt and the formation of sub-boundaries.

  3. Epitaxial lateral overgrowth of GaN

    Energy Technology Data Exchange (ETDEWEB)

    Beaumont, B.; Vennegues, P.; Gibart, P. [CNRS, Sophia Antipolis, Valbonne (France). CRHEA

    2001-09-01

    Since there is no GaN bulk single crystal available, the whole technological development of GaN based devices relies on heteroepitaxy. Numerous defects are generated in the heteroepitaxy of GaN on sapphire or 6H-SiC, mainly threading dislocations (TDs). Three types of TDs are currently observed, a type (with Burgers vector 1/3 left angle 11 anti 20 right angle); c type (with left angle 0001 right angle) and mixed a + c (1/3 left angle 11 anti 23 right angle). The epitaxial lateral overgrowth (ELO) technology produces high quality GaN with TD densities in the mid 10{sup 6} cm{sup -2}, linewidth of the low-temperature photoluminescence (PL) near-bandgap recombination peaks <1 meV and deep electron traps reduced below 10{sup 14} cm{sup -3} (compared to mid 10{sup 15} cm{sup -3} in standard GaN). Numerous modifications of the ELO process have been proposed in order either to avoid technological steps (mask-less ELO) or to improve it (pendeo-epitaxy). Basically developed on either sapphire or 6H-SiC, the ELO technology is also achievable on (111)Si or (111)3C-SiC/Si provided that an appropriate buffer layer is grown to avoid cracks. More sophisticated technologies have been implemented to further increase the useable part of the ELO GaN surface (two technological steps, three-step ELO). Unfortunately, in-depth understanding of the basic ELO process is still missing, i.e. of the growth anisotropy and bending of dislocations. (orig.)

  4. Influence of a GaN Cap Layer on the Morphology and the Physical Properties of Embedded Self-Organized InN Quantum Dots on GaN(0001) Grown by Metal-Organic Vapour Phase Epitaxy

    Science.gov (United States)

    Ivaldi, Francesco; Meissner, Christian; Domagala, Jarosław; Kret, Sławomir; Pristovsek, Markus; Högele, Michael; Kneissl, Michael

    2011-03-01

    Self-organized InN quantum dots were grown on GaN(0001) by metal-organic vapour phase epitaxy. Transmission electron microscopy (TEM) measurements found no wetting layer, i.e., the dots grow directly in Volmer-Weber growth mode. The dots were capped with GaN by three different procedures. Direct overgrowth at the same temperature as the dot formation produced the smoothest surfaces. Cubic and hexagonal GaN was observed in the cap layer, as well as strong indium intermixing. The dot size and volume was reduced during overgrowth. The dots were ˜90% relaxed with many dislocations at the interface from GaN to InN. The photoluminescence of the dots was very weak due to the dislocation.

  5. Structural and morphological characterization of GaN(0001) layers grown on SiC by maskless pendeo-epitaxy via X-ray Microdiffraction

    Science.gov (United States)

    Barabash, R. I.; Einfeldt, S.; Roskovski, A. M.

    2005-03-01

    Novel white beam X-ray microdiffraction (WBD) together with high resolution monochromatic X-ray diffraction (HRXRD) and finite element simulations have been used to determine the distribution of strain, dislocations, sub-boundaries and crystallographic wing tilt in uncoalesced and coalesced GaN layers grown by maskless pendeo-epitaxy. In traditional HRXRD the spot size of the X-ray beam is large (˜0.5 mm), i.e. it gives information averaged over 40-50 of stripes. In contrast, advanced WBD provides very local information and enables us to follow the local orientation at different locations across the stripe. Stress relaxation in the GaN layers occurs in conventional and in pendeo-epitaxial films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. An important parameter was the width-to-height ratio of the etched columns of GaN from which the lateral growth of the wings occurred. The strain and tilt across the stripes increased with the width-to-height ratio. Sharp tilt boundaries were observed at the interfaces formed by the coalescence of two laterally growing wings. The wings tilted upward during cooling to room temperature for both the uncoalesced and the coalesced GaN layers

  6. Effect of Ga seeding layer on formation of epitaxial Y-shaped GaN nanoparticles on silicon

    Science.gov (United States)

    Fedorov, V. V.; Bolshakov, A. D.; Mozharov, A. M.; Sapunov, G. A.; Shtrom, I. V.; Kirilenko, D. A.; Sitnikova, A. A.; Mukhin, I. S.

    2017-11-01

    Silicon and aluminium nitrides, commonly used as buffer layers for GaN growth on Si are wide gap insulators, preventing barrier free charge-carrier transport across the heterojunction and limiting the functionality of GaN-on-silicon technology. In this work we explore possibility of direct growth of GaN on Si nano-heterostructures by PA-MBE with use of Ga-nanodroplets as seeds. It is demonstrated that use of seeding layer can result in formation of Y-shaped planar GaN nanoparticles (GaN tripods) along with commonly observed GaN nanowires. Growth mechanism, morphology and structural characterization of GaN/Si nano-heterostructures is discussed.

  7. Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs

    OpenAIRE

    Huan-Yu Shih; Makoto Shiojiri; Ching-Hsiang Chen; Sheng-Fu Yu; Chung-Ting Ko; Jer-Ren Yang; Ray-Ming Lin; Miin-Jang Chen

    2015-01-01

    High threading dislocation (TD) density in GaN-based devices is a long unresolved problem because of the large lattice mismatch between GaN and the substrate, which causes a major obstacle for the further improvement of next-generation high-efficiency solid-state lighting and high-power electronics. Here, we report InGaN/GaN LEDs with ultralow TD density and improved efficiency on a sapphire substrate, on which a near strain-free GaN compliant buffer layer was grown by remote plasma atomic la...

  8. Local Strain, Defects and Crystallographic Tilt in GaN(0001) Layers Grown by Maskless Pendeo-epitaxy from X-ray Microdiffraction

    Energy Technology Data Exchange (ETDEWEB)

    Barabash, R.I.; Ice, G.E.; Liu, W.; Einfeldt, S.; Roskovski, A.M.; Davis, R.F. (ORNL)

    2010-07-13

    Polychromatic x-ray microdiffraction, high-resolution monochromatic x-ray diffraction, and finite element simulations have been used to determine the distribution of strain, defects, and crystallographic tilt in uncoalesced GaN layers grown by maskless pendeo-epitaxy. An important materials parameter was the width-to-height ratio of the etched columns of GaN from which occurred the lateral growth of the wings. Tilt boundaries formed at the column/wing interface for samples with a large ratio. Formation of the tilt boundary can be avoided by using smaller ratios. The strain and tilt across the stripe increased with the width-to-height ratio. The wings were tilted upward at room temperature.

  9. Local strain, defects, and crystallographic tilt in GaN(0001) layers grown by maskless pendeo-epitaxy from x-ray microdiffraction

    Science.gov (United States)

    Barabash, R. I.; Ice, G. E.; Liu, W.; Einfeldt, S.; Roskowski, A. M.; Davis, R. F.

    2005-01-01

    Polychromatic x-ray microdiffraction, high-resolution monochromatic x-ray diffraction, and finite element simulations have been used to determine the distribution of strain, defects, and crystallographic tilt in uncoalesced GaN layers grown by maskless pendeo-epitaxy. An important materials parameter was the width-to-height ratio of the etched columns of GaN from which occurred the lateral growth of the wings. Tilt boundaries formed at the column/wing interface for samples with a large ratio. Formation of the tilt boundary can be avoided by using smaller ratios. The strain and tilt across the stripe increased with the width-to-height ratio. The wings were tilted upward at room temperature.

  10. Electrothermal evaluation of thick GaN epitaxial layers and AlGaN/GaN high-electron-mobility transistors on large-area engineered substrates

    Science.gov (United States)

    Anderson, Travis J.; Koehler, Andrew D.; Tadjer, Marko J.; Hite, Jennifer K.; Nath, Anindya; Mahadik, Nadeemullah A.; Aktas, Ozgur; Odnoblyudov, Vladimir; Basceri, Cem; Hobart, Karl D.; Kub, Francis J.

    2017-12-01

    AlGaN/GaN high-electron-mobility transistor (HEMT) device layers were grown by metal organic chemical vapor deposition (MOCVD) on commercial engineered QST™ substrates to demonstrate a path to scalable, cost-effective foundry processing while supporting the thick epitaxial layers required for power HEMT structures. HEMT structures on 150 mm Si substrates were also evaluated. The HEMTs on engineered substrates exhibited material quality, DC performance, and forward blocking performance superior to those of the HEMT on Si. GaN device layers up to 15 µm were demonstrated with a wafer bow of 1 µm, representing the thickest films grown on 150-mm-diameter substrates with low bow to date.

  11. Low temperature sapphire nitridation: A clue to optimize GaN layers grown by molecular beam epitaxy

    Science.gov (United States)

    Widmann, F.; Feuillet, G.; Daudin, B.; Rouvière, J. L.

    1999-02-01

    The sapphire nitridation temperature is investigated as a possible parameter to improve the properties of GaN epilayers grown by molecular beam epitaxy using a radio frequency plasma source. It is found out that lowering the nitridation temperature to values as low as 200 °C allows us to drastically improve the GaN structural and optical properties. Careful examination of the interface by transmission electron microscopy reveals that, in this case, the interface between the nitridated sapphire and the AlN buffer consists of an ordered array of pure edge dislocations. In contrast, high nitridation temperatures result in a perturbed interface with the occurrence of cubic crystallites in the AlN buffer. These results, complemented by a thorough reflection high-energy electron diffraction analysis of the nitridation procedure and a secondary ion mass spectrometry investigation, are interpreted in the framework of a model whereby a higher oxygen concentration is extracted from the substrate at high nitridation temperature, leading to the formation of cubic grains with a smaller lattice parameter than the surrounding matrix and to the concomitant occurrence of defects within the buffer.

  12. Dependence of the Mg-related acceptor ionization energy with the acceptor concentration in p-type GaN layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Brochen, Stephane; Brault, Julien; Chenot, Sebastien; Dussaigne, Amelie; Leroux, Mathieu; Damilano, Benjamin [CNRS-CRHEA, Rue Bernard Gregory, F-06560 Valbonne (France)

    2013-07-15

    Hall effect and capacitance-voltage C(V) measurements were performed on p-type GaN:Mg layers grown on GaN templates by molecular beam epitaxy with a high range of Mg-doping concentrations. The free hole density and the effective dopant concentration N{sub A}-N{sub D} as a function of magnesium incorporation measured by secondary ion mass spectroscopy clearly reveal both a magnesium doping efficiency up to 90% and a strong dependence of the acceptor ionization energy Ea with the acceptor concentration N{sub A}. These experimental observations highlight an isolated acceptor binding energy of 245{+-}25 meV compatible, at high acceptor concentration, with the achievement of p-type GaN:Mg layers with a hole concentration at room temperature close to 10{sup 19} cm{sup -3}.

  13. Hall-effect measurements of metalorganic vapor-phase epitaxy-grown p-type homoepitaxial GaN layers with various Mg concentrations

    Science.gov (United States)

    Horita, Masahiro; Takashima, Shinya; Tanaka, Ryo; Matsuyama, Hideaki; Ueno, Katsunori; Edo, Masaharu; Takahashi, Tokio; Shimizu, Mitsuaki; Suda, Jun

    2017-03-01

    Mg-doped p-type gallium nitride (GaN) layers with doping concentrations in the range from 6.5 × 1016 cm-3 (lightly doped) to 3.8 × 1019 cm-3 (heavily doped) were investigated by Hall-effect measurement for the analysis of hole concentration and mobility. p-GaN was homoepitaxially grown on a GaN free-standing substrate by metalorganic vapor-phase epitaxy. The threading dislocation density of p-GaN was 4 × 106 cm-2 measured by cathodoluminescence mapping. Hall-effect measurements of p-GaN were carried out at a temperature in the range from 130 to 450 K. For the lightly doped p-GaN, the acceptor concentration of 7.0 × 1016 cm-3 and the donor concentration of 3.2 × 1016 cm-3 were obtained, where the compensation ratio was 46%. We also obtained the depth of the Mg acceptor level to be 220 meV. The hole mobilities of 86, 31, 14 cm2 V-1 s-1 at 200, 300, 400 K, respectively, were observed in the lightly doped p-GaN.

  14. Dislocation density investigation on MOCVD-grown GaN epitaxial layers using wet and dry defect selective etching

    Science.gov (United States)

    Pandey, Akhilesh; Yadav, Brajesh S.; Rao, D. V. Sridhara; Kaur, Davinder; Kapoor, Ashok Kumar

    2016-06-01

    Results on the investigations of the dislocation etch pits in the GaN layers grown on sapphire substrate by metal organic chemical vapor deposition are revealed by wet chemical etching, and dry etching techniques are reported. The wet etching was carried out in molten KOH, and inductively coupled plasma (ICP) was used for dry etching. We show that ICP using dry etching and wet chemical etching using KOH solution under optimal conditions give values of dislocation density comparable to the one obtained from the high-resolution X-ray diffraction, atomic force microscopy and transmission electron microscopy investigations. Investigated threading dislocation density is in the order of ~109/cm2 using different techniques.

  15. Application of orthodox defect-selective etching for studying GaN single crystals, epitaxial layers and device structures

    NARCIS (Netherlands)

    Kamler, G.; Borysiuk, J.; Weyher, J.L.; Presz, A.; Wozniak, M.; Grzegory, I.

    2004-01-01

    In this communication, results are presented of the application of etching in molten E+M etch (KOH-NaOH eutectic mixture with 10% MgO) for studying defects in GaN. The method was used to study defects on differently oriented cleavage and basal planes of GaN single crystals, MOCVD-, MBE- and

  16. Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs

    National Research Council Canada - National Science Library

    Shih, Huan-Yu; Shiojiri, Makoto; Chen, Ching-Hsiang; Yu, Sheng-Fu; Ko, Chung-Ting; Yang, Jer-Ren; Lin, Ray-Ming; Chen, Miin-Jang

    2015-01-01

    High threading dislocation (TD) density in GaN-based devices is a long unresolved problem because of the large lattice mismatch between GaN and the substrate, which causes a major obstacle for the further improvement of next...

  17. Critical issues for homoepitaxial GaN growth by molecular beam epitaxy on hydride vapor-phase epitaxy-grown GaN substrates

    Science.gov (United States)

    Storm, D. F.; Hardy, M. T.; Katzer, D. S.; Nepal, N.; Downey, B. P.; Meyer, D. J.; McConkie, Thomas O.; Zhou, Lin; Smith, David J.

    2016-12-01

    While the heteroepitaxial growth of gallium nitride-based materials and devices on substrates such as SiC, sapphire, and Si has been well-documented, the lack of a cost-effective source of bulk GaN crystals has hindered similar progress on homoepitaxy. Nevertheless, freestanding GaN wafers are becoming more widely available, and there is great interest in growing GaN films and devices on bulk GaN substrates, in order to take advantage of the greatly reduced density of threading dislocations, particularly for vertical devices. However, homoepitaxial GaN growth is far from a trivial task due to the reactivity and different chemical sensitivities of N-polar (0001) and Ga-polar (0001) GaN surfaces, which can affect the microstructure and concentrations of impurities in homoepitaxial GaN layers. In order to achieve high quality, high purity homoepitaxial GaN, it is necessary to investigate the effect of the ex situ wet chemical clean, the use of in situ cleaning procedures, the sensitivity of the GaN surface to thermal decomposition, and the effect of growth temperature. We review the current understanding of these issues with a focus on homoepitaxial growth of GaN by molecular beam epitaxy (MBE) on c-plane surfaces of freestanding GaN substrates grown by hydride vapor phase epitaxy (HVPE), as HVPE-grown substrates are most widely available. We demonstrate methods for obtaining homoepitaxial GaN layers by plasma-assisted MBE in which no additional threading dislocations are generated from the regrowth interface and impurity concentrations are greatly reduced.

  18. Effect of Al /N ratio during nucleation layer growth on Hall mobility and buffer leakage of molecular-beam epitaxy grown AlGaN /GaN heterostructures

    Science.gov (United States)

    Storm, D. F.; Katzer, D. S.; Binari, S. C.; Shanabrook, B. V.; Zhou, Lin; Smith, David J.

    2004-10-01

    AlGaN /GaN high electron mobility transistor structures have been grown by plasma-assisted molecular beam epitaxy on semi-insulating 4H-SiC utilizing an AlN nucleation layer. The electron Hall mobility of these structures increases from 1050cm2/Vs to greater than 1450cm2/Vs when the Al /N flux ratio during the growth of the nucleation layer is increased from 0.90 to 1.07. Buffer leakage currents increase abruptly by nearly three orders of magnitude when the Al /N ratio increases from below to above unity. Transmission electron microscopy indicates that high buffer leakage is correlated with the presence of stacking faults in the nucleation layer and cubic phase GaN in the buffer, while low mobilities are correlated with high dislocation densities.

  19. Effect of growth temperature on defects in epitaxial GaN film grown by plasma assisted molecular beam epitaxy

    Directory of Open Access Journals (Sweden)

    S. S. Kushvaha

    2014-02-01

    Full Text Available We report the effect of growth temperature on defect states of GaN epitaxial layers grown on 3.5 μm thick GaN epi-layer on sapphire (0001 substrates using plasma assisted molecular beam epitaxy. The GaN samples grown at three different substrate temperatures at 730, 740 and 750 °C were characterized using atomic force microscopy and photoluminescence spectroscopy. The atomic force microscopy images of these samples show the presence of small surface and large hexagonal pits on the GaN film surfaces. The surface defect density of high temperature grown sample is smaller (4.0 × 108 cm−2 at 750 °C than that of the low temperature grown sample (1.1 × 109 cm−2 at 730 °C. A correlation between growth temperature and concentration of deep centre defect states from photoluminescence spectra is also presented. The GaN film grown at 750 °C exhibits the lowest defect concentration which confirms that the growth temperature strongly influences the surface morphology and affects the optical properties of the GaN epitaxial films.

  20. Effect of growth temperature on defects in epitaxial GaN film grown by plasma assisted molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Kushvaha, S. S., E-mail: kushvahas@nplindia.org; Pal, P.; Shukla, A. K.; Joshi, Amish G.; Gupta, Govind; Kumar, M.; Singh, S.; Gupta, Bipin K.; Haranath, D. [CSIR- National Physical Laboratory, Dr. K. S. Krishnan Road, New Delhi, India 110012 (India)

    2014-02-15

    We report the effect of growth temperature on defect states of GaN epitaxial layers grown on 3.5 μm thick GaN epi-layer on sapphire (0001) substrates using plasma assisted molecular beam epitaxy. The GaN samples grown at three different substrate temperatures at 730, 740 and 750 °C were characterized using atomic force microscopy and photoluminescence spectroscopy. The atomic force microscopy images of these samples show the presence of small surface and large hexagonal pits on the GaN film surfaces. The surface defect density of high temperature grown sample is smaller (4.0 × 10{sup 8} cm{sup −2} at 750 °C) than that of the low temperature grown sample (1.1 × 10{sup 9} cm{sup −2} at 730 °C). A correlation between growth temperature and concentration of deep centre defect states from photoluminescence spectra is also presented. The GaN film grown at 750 °C exhibits the lowest defect concentration which confirms that the growth temperature strongly influences the surface morphology and affects the optical properties of the GaN epitaxial films.

  1. Origin of yellow-band emission in epitaxially grown GaN nanowire arrays.

    Science.gov (United States)

    Liu, Baodan; Yuan, Fang; Dierre, Benjamin; Sekiguchi, Takashi; Zhang, Song; Xu, Yongkuan; Jiang, Xin

    2014-08-27

    Here, we report the origin of the yellow-band emission in epitaxial GaN nanowire arrays grown under carbon-free conditions. GaN nanowires directly grown on [0001]-oriented sapphire substrate exhibit an obvious and broad yellow-band in the visible range 400-800 nm, whereas the insertion of Al/Au layers in GaN-sapphire interface significantly depresses the visible emission, and only a sharp peak in the UV range (369 nm) can be observed. The persuasive differences in cathodoluminescence provide direct evidence for demonstrating that the origin of the yellow-band emission in GaN nanowire arrays arises from dislocation threading. The idea using buffering/barrier layers to isolate the dislocation threading in epitaxially grown GaN nanowires can be extended to the rational synthesis and structural defect controlling of a wide range of semiconductor films and nanostructures with superior crystal quality and excellent luminescence property.

  2. Optical and structural characterisation of epitaxial nanoporous GaN grown by CVD

    Science.gov (United States)

    Mena, Josué; Carvajal, Joan J.; Martínez, Oscar; Jiménez, Juan; Zubialevich, Vitaly Z.; Parbrook, Peter J.; Diaz, Francesc; Aguiló, Magdalena

    2017-09-01

    In this paper we study the optical properties of nanoporous gallium nitride (GaN) epitaxial layers grown by chemical vapour deposition on non-porous GaN substrates, using photoluminescence, cathodoluminescence, and resonant Raman scattering, and correlate them with the structural characteristic of these films. We pay special attention to the analysis of the residual strain of the layers and the influence of the porosity in the light extraction. The nanoporous GaN epitaxial layers are under tensile strain, although the strain is progressively reduced as the deposition time and the thickness of the porous layer increases, becoming nearly strain free for a thickness of 1.7 μm. The analysis of the experimental data point to the existence of vacancy complexes as the main source of the tensile strain.

  3. Epitaxial growth and optical transitions of cubic GaN films

    Science.gov (United States)

    Schikora, D.; Hankeln, M.; As, D. J.; Lischka, K.; Litz, T.; Waag, A.; Buhrow, T.; Henneberger, F.

    1996-09-01

    Single-phase cubic GaN layers are grown by plasma-assisted molecular-beam epitaxy. The temperature dependence of the surface reconstruction is elaborated. The structural stability of the cubic growth in dependence of the growth stoichiometry is studied by RHEED measurements and numerical simulations of the experimental RHEED patterns. Growth oscillations on cubic GaN are recorded at higher substrate temperatures and nearly stoichiometric adatom coverage. Photoluminescence reveals the dominant optical transitions of cubic GaN and, by applying an external magnetic field, their characteristic g factors are determined.

  4. Cubic GaN epilayers grown by molecular beam epitaxy on thin β-SiC/Si (001) substrates

    Science.gov (United States)

    As, D. J.; Frey, T.; Schikora, D.; Lischka, K.; Cimalla, V.; Pezoldt, J.; Goldhahn, R.; Kaiser, S.; Gebhardt, W.

    2000-03-01

    The molecular beam epitaxy of cubic GaN on Si(001) substrates, which were covered by a 4 nm thick β-SiC layer, is reported. The structural and optical properties of the cubic GaN epilayers were studied by transmission electron microscopy, high-resolution x-ray diffraction, and low-temperature photoluminescence measurements. We find clear evidence for the growth of cubic GaN layers almost free of hexagonal inclusions. The density of extended defects and the near band edge photoluminescence of the cubic GaN layers grown at substrate temperatures of 835 °C is comparable to that of high quality cubic GaN epilayers grown by molecular beam epitaxy on GaAs (001) substrates.

  5. Wafer-scale epitaxial lift-off of optoelectronic grade GaN from a GaN substrate using a sacrificial ZnO interlayer

    Science.gov (United States)

    Rajan, Akhil; Rogers, David J.; Ton-That, Cuong; Zhu, Liangchen; Phillips, Matthew R.; Sundaram, Suresh; Gautier, Simon; Moudakir, Tarik; El-Gmili, Youssef; Ougazzaden, Abdallah; Sandana, Vinod E.; Teherani, Ferechteh H.; Bove, Philippe; Prior, Kevin A.; Djebbour, Zakaria; McClintock, Ryan; Razeghi, Manijeh

    2016-08-01

    Full 2 inch GaN epilayers were lifted off GaN and c-sapphire substrates by preferential chemical dissolution of sacrificial ZnO underlayers. Modification of the standard epitaxial lift-off (ELO) process by supporting the wax host with a glass substrate proved key in enabling full wafer scale-up. Scanning electron microscopy and x-ray diffraction confirmed that intact epitaxial GaN had been transferred to the glass host. Depth-resolved cathodoluminescence (CL) analysis of the bottom surface of the lifted-off GaN layer revealed strong near-band-edge (3.33 eV) emission indicating a superior optical quality for the GaN which was lifted off the GaN substrate. This modified ELO approach demonstrates that previous theories proposing that wax host curling was necessary to keep the ELO etch channel open do not apply to the GaN/ZnO system. The unprecedented full wafer transfer of epitaxial GaN to an alternative support by ELO offers the perspective of accelerating industrial adoption of the expensive GaN substrate through cost-reducing recycling.

  6. Surface irregularities of MBE grown cubic GaN layers

    Science.gov (United States)

    Lima, A. P.; Frey, T.; Köhler, U.; Wang, C.; As, D. J.; Schöttker, B.; Lischka, K.; Schikora, D.

    1999-02-01

    Cubic GaN layers are grown by molecular beam epitaxy on (0 0 1)GaAs substrates. The influence of intentional deviations from stoichiometric growth conditions on the structural homogeneity of the epitaxial layers and the GaN/GaAs interface was studied. Optical micrographs and AFM-images of the epilayers grown in a Ga-stabilised regime reveal the existence of different types of surface irregularities. We conclude that the irregularities observed are the result of successively melt-back etching in GaN and GaAs and solution growth within Ga-droplets due to the change of the saturation conditions of the liquid Ga-phase on the surface of the growing film.

  7. Radical Beam Gettering Epitaxy of Zno and Gan

    Science.gov (United States)

    Georgobiani, A. N.; Demin, V. I.; Vorobiev, M. O.; Gruzintsev, A. N.; Hodos, I. I.; Kotljarevsky, M. B.; Kidalov, V. V.; Rogozin, I. V.

    2002-11-01

    P-type ZnO layers with a hole mobility about 23 cm2/(V s), and a hole concentration about 1015 cm-3 were grown by means of radical-beam gettering epitaxy (the annealing of n-ZnO single crystals in atomic oxygen flux). The effect of native defects on the photoluminescence spectra of the layers was studied. The dominant bands in the spectra peaked at 370.2 and 400 nm. These bands were attributed to the annihilation of exciton localised on neutral Vzn and to electron transitions from the conduction band to singly positively charged Vzn correspondingly. The effect of annealing in atomic nitrogen flux of p-CaN:Mg films on their photoluminescence spectra and on the value of their conductivity were studied. Such annealing leads to appearance of a number of emission bands that peaked at 404.9, 390.8 and 378.9 nm and increases hole concentration from 5 × 1015 to 5 × 1016 cm-3, and the hole mobility from 120 to 150 cm2/(V s). The n-ZnO - p-GaN:Mg electroluminescence heterostructures were obtained. Their spectrum contains bands in the excitonic region of GaN at the wavelength 360.2 nm and in the edge region at wavelengths 378.9 and 390.8 nm.

  8. GaN Bulk Growth and Epitaxy from Ca-Ga-N Solutions Project

    Data.gov (United States)

    National Aeronautics and Space Administration — This SBIR proposal addresses the liquid phase epitaxy (LPE) of gallium nitride (GaN) films using nitrogen-enriched metal solutions. Growth of GaN from solutions...

  9. Structural properties of GaN grown by pendeo-epitaxy with In-doping

    Energy Technology Data Exchange (ETDEWEB)

    Hong, Y.K.; Kim, C.S.; Jung, H.S.; Hong, C.H. [Chonbuk National Univ., Chonju (Korea). Semiconductor Physics Research Center; Chonbuk National Univ., Chonju (Korea). Dept. of Semiconductor Science and Technology; Kim, M.H.; Leem, S.J. [Dept. of OE Team, Device and Materials Lab., LG Electronics Inst. of Tech., Seoul (Korea); Cho, H.K.; Lee, J.Y. [Dept. of Materials Science and Engineering, Korea Advanced Inst. of Science and Technology, Taejon (Korea)

    2001-11-01

    We have studied the effect of isoelectronic In-doping on the structural properties of GaN grown by pendeo-epitaxy. From an analysis of cross-sectional transmission electron microscopy (TEM) images, the threading dislocation originating from the (0001) facet of GaN seed layer, thereafter propagating onto the top surface of regrown GaN layer, were reduced due to isoelectronic In-doping, which could enhance vacancy trapping. In addition, threading dislocations in the coalescence region were not observable. These results indicate that these dislocations are bent or terminated in the boundary of coalesced region. Also, the crystalline quality was improved from the results of high resolution X-ray diffraction and TEM measurements. (orig.)

  10. X-ray diffraction peak profiles from threading dislocations in GaN epitaxial films

    OpenAIRE

    Kaganer, V M; Brandt, O.; Trampert, A.; Ploog, K. H.

    2004-01-01

    We analyze the lineshape of x-ray diffraction profiles of GaN epitaxial layers with large densities of randomly distributed threading dislocations. The peaks are Gaussian only in the central, most intense part of the peak, while the tails obey a power law. The $q^{-3}$ decay typical for random dislocations is observed in double-crystal rocking curves. The entire profile is well fitted by a restricted random dislocation distribution. The densities of both edge and screw threading dislocations ...

  11. CVD solutions for new directions in SiC and GaN epitaxy

    OpenAIRE

    Li, Xun

    2015-01-01

    This thesis aims to develop a chemical vapor deposition (CVD) process for the new directions in both silicon carbon (SiC) and gallium nitride (GaN) epitaxial growth. The properties of the grown epitaxial layers are investigated in detail in order to have a deep understanding. SiC is a promising wide band gap semiconductor material which could be utilized for fabricating high-power and high-frequency devices. 3C-SiC is the only polytype with a cubic structure and has superior physical properti...

  12. Large area lateral epitaxial overgrowth (LEO) of gallium nitride (GaN) thin films on silicon substrates and their characterization. Annual report, 1 March 1998--28 February 1999

    Energy Technology Data Exchange (ETDEWEB)

    Davis, R.F.; Carlson, E.P.; Gehrke, T.; Linthicum, K.; Smith, T.P.

    1999-03-01

    Gallium nitride films have been grown on 6H-SiC substrates employing a new form of selective lateral epitaxy, namely pendeo-epitaxy. This technique forces regrowth to start exclusively on sidewalls of GaN seed structures. Both discrete pendeo-epitaxial microstructures and coalesced single crystal layers of GaN have been achieved. Analysis by SEM and TEM are used to evaluate the morphology of the resulting GaN films. Process routes leading to GaN pendeo- epitaxial growth using silicon substrates have also been achieved and the preliminary results are discussed.

  13. Atomic force microscopy studies of homoepitaxial GaN layers grown on GaN template by laser MBE

    Science.gov (United States)

    Choudhary, B. S.; Singh, A.; Tanwar, S.; Tyagi, P. K.; Kumar, M. Senthil; Kushvaha, S. S.

    2016-04-01

    We have grown homoepitaxial GaN films on metal organic chemical vapor deposition (MOCVD) grown 3.5 µm thick GaN on sapphire (0001) substrate (GaN template) using an ultra-high vacuum (UHV) laser assisted molecular beam epitaxy (LMBE) system. The GaN films were grown by laser ablating a polycrystalline solid GaN target in the presence of active r.f. nitrogen plasma. The influence of laser repetition rates (10-30 Hz) on the surface morphology of homoepitaxial GaN layers have been studied using atomic force microscopy. It was found that GaN layer grown at 10 Hz shows a smooth surface with uniform grain size compared to the rough surface with irregular shape grains obtained at 30 Hz. The variation of surface roughness of the homoepitaxial GaN layer with and without wet chemical etching has been also studied and it was observed that the roughness of the film decreased after wet etching due to the curved structure/rough surface.

  14. Metal organic vapour phase epitaxy of GaN and lateral overgrowth

    Science.gov (United States)

    Gibart, Pierre

    2004-05-01

    the deposition of a buffer layer, which, to some extent, accommodates the mismatch. Using appropriate nucleation layers allows a reduction of the dislocation density to the low 108 cm-2 range. Though laser diodes (LDs) were demonstrated in the late 1990s with such defect layers, the real breakthrough in laser technology was the dramatic improvement of the LD lifetime at the end of 1997, with the lifetime reaching 10 000 h. This was made possible by implementation of epitaxial lateral overgrowth (ELO) technology, which significantly reduces the dislocation density to below 107 cm-2. In ELO technology, parts of the highly dislocated starting GaN are masked with a dielectric mask, after which growth is restarted. At the beginning of the second growth step, deposition only occurs within the openings, with no deposition observed on the mask. This is referred to as selective area epitaxy (SAE). The TDs are prevented from propagating into the overlayer by the dielectric mask, whereas GaN grown above the opening (coherent growth) keeps the same TD density as the template, at least during the early stages of growth. Currently, two main ELO technologies exist: the simpler one involves a single growth step on striped openings. In this one-step-ELO (1S-ELO), growth in the opening remains in registry with the GaN template underneath (coherent part), whereas the GaN over the mask extends laterally (wings). This leads to two grades, namely highly dislocated GaN, above the openings, and low dislocation density GaN, above the masks. With this technique, devices have to be fabricated on the wings. Conversely, in the two-step-ELO (2S-ELO) process, the growth conditions of the first step are monitored to obtain triangular stripes. Inside these stripes, the TDs arising from the templates are bent by 90° when they encounter the inclined lateral facet. In the second step, the growth conditions are modified to achieve full coalescence. In this 2S-ELO technology, only the coalescence

  15. Hafnium nitride buffer layers for growth of GaN on silicon

    Science.gov (United States)

    Armitage, Robert D.; Weber, Eicke R.

    2005-08-16

    Gallium nitride is grown by plasma-assisted molecular-beam epitaxy on (111) and (001) silicon substrates using hafnium nitride buffer layers. Wurtzite GaN epitaxial layers are obtained on both the (111) and (001) HfN/Si surfaces, with crack-free thickness up to 1.2 {character pullout}m. However, growth on the (001) surface results in nearly stress-free films, suggesting that much thicker crack-free layers could be obtained.

  16. Metal organic vapour phase epitaxy of GaN and lateral overgrowth

    Energy Technology Data Exchange (ETDEWEB)

    Gibart, Pierre [Lumilog S.A., 2720, Chemin Saint Bernard, Les Moulins I, F-06220 Vallauris (France)

    2004-05-01

    impossible. Therefore, the growth of GaN on any substrate first requires the deposition of a buffer layer, which, to some extent, accommodates the mismatch. Using appropriate nucleation layers allows a reduction of the dislocation density to the low 10{sup 8} cm{sup -2} range. Though laser diodes (LDs) were demonstrated in the late 1990s with such defect layers, the real breakthrough in laser technology was the dramatic improvement of the LD lifetime at the end of 1997, with the lifetime reaching 10 000 h. This was made possible by implementation of epitaxial lateral overgrowth (ELO) technology, which significantly reduces the dislocation density to below 10{sup 7} cm{sup -2}. In ELO technology, parts of the highly dislocated starting GaN are masked with a dielectric mask, after which growth is restarted. At the beginning of the second growth step, deposition only occurs within the openings, with no deposition observed on the mask. This is referred to as selective area epitaxy (SAE). The TDs are prevented from propagating into the overlayer by the dielectric mask, whereas GaN grown above the opening (coherent growth) keeps the same TD density as the template, at least during the early stages of growth. Currently, two main ELO technologies exist: the simpler one involves a single growth step on striped openings. In this one-step-ELO (1S-ELO), growth in the opening remains in registry with the GaN template underneath (coherent part), whereas the GaN over the mask extends laterally (wings). This leads to two grades, namely highly dislocated GaN, above the openings, and low dislocation density GaN, above the masks. With this technique, devices have to be fabricated on the wings. Conversely, in the two-step-ELO (2S-ELO) process, the growth conditions of the first step are monitored to obtain triangular stripes. Inside these stripes, the TDs arising from the templates are bent by 90 deg. when they encounter the inclined lateral facet. In the second step, the growth conditions are

  17. Nanoselective area growth of GaN by metalorganic vapor phase epitaxy on 4H-SiC using epitaxial graphene as a mask

    Energy Technology Data Exchange (ETDEWEB)

    Puybaret, Renaud; Jordan, Matthew B.; Voss, Paul L.; Ougazzaden, Abdallah, E-mail: aougazza@georgiatech-metz.fr [School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States); CNRS UMI 2958, Georgia Institute of Technology, 2 Rue Marconi, 57070 Metz (France); Patriarche, Gilles [CNRS, Laboratoire de Photonique et de Nanostructures, Route de Nozay, 91460 Marcoussis (France); Sundaram, Suresh; El Gmili, Youssef [CNRS UMI 2958, Georgia Institute of Technology, 2 Rue Marconi, 57070 Metz (France); Salvestrini, Jean-Paul [Université de Lorraine, CentraleSupélec, LMOPS, EA4423, 57070 Metz (France); Heer, Walt A. de [School of Physics, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States); Berger, Claire [School of Physics, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States); CNRS, Institut Néel, BP166, 38042 Grenoble Cedex 9 (France)

    2016-03-07

    We report the growth of high-quality triangular GaN nanomesas, 30-nm thick, on the C-face of 4H-SiC using nanoselective area growth (NSAG) with patterned epitaxial graphene grown on SiC as an embedded mask. NSAG alleviates the problems of defects in heteroepitaxy, and the high mobility graphene film could readily provide the back low-dissipative electrode in GaN-based optoelectronic devices. A 5–8 graphene-layer film is first grown on the C-face of 4H-SiC by confinement-controlled sublimation of silicon carbide. Graphene is then patterned and arrays of 75-nm-wide openings are etched in graphene revealing the SiC substrate. A 30-nm-thick GaN is subsequently grown by metal organic vapor phase epitaxy. GaN nanomesas grow epitaxially with perfect selectivity on SiC, in the openings patterned through graphene. The up-or-down orientation of the mesas on SiC, their triangular faceting, and cross-sectional scanning transmission electron microscopy show that they are biphasic. The core is a zinc blende monocrystal surrounded with single-crystal wurtzite. The GaN crystalline nanomesas have no threading dislocations or V-pits. This NSAG process potentially leads to integration of high-quality III-nitrides on the wafer scalable epitaxial graphene/silicon carbide platform.

  18. Nanoselective area growth of GaN by metalorganic vapor phase epitaxy on 4H-SiC using epitaxial graphene as a mask

    Science.gov (United States)

    Puybaret, Renaud; Patriarche, Gilles; Jordan, Matthew B.; Sundaram, Suresh; El Gmili, Youssef; Salvestrini, Jean-Paul; Voss, Paul L.; de Heer, Walt A.; Berger, Claire; Ougazzaden, Abdallah

    2016-03-01

    We report the growth of high-quality triangular GaN nanomesas, 30-nm thick, on the C-face of 4H-SiC using nanoselective area growth (NSAG) with patterned epitaxial graphene grown on SiC as an embedded mask. NSAG alleviates the problems of defects in heteroepitaxy, and the high mobility graphene film could readily provide the back low-dissipative electrode in GaN-based optoelectronic devices. A 5-8 graphene-layer film is first grown on the C-face of 4H-SiC by confinement-controlled sublimation of silicon carbide. Graphene is then patterned and arrays of 75-nm-wide openings are etched in graphene revealing the SiC substrate. A 30-nm-thick GaN is subsequently grown by metal organic vapor phase epitaxy. GaN nanomesas grow epitaxially with perfect selectivity on SiC, in the openings patterned through graphene. The up-or-down orientation of the mesas on SiC, their triangular faceting, and cross-sectional scanning transmission electron microscopy show that they are biphasic. The core is a zinc blende monocrystal surrounded with single-crystal wurtzite. The GaN crystalline nanomesas have no threading dislocations or V-pits. This NSAG process potentially leads to integration of high-quality III-nitrides on the wafer scalable epitaxial graphene/silicon carbide platform.

  19. Correlation between threading dislocations in highly mismatched GaN heteroepitaxial layers

    Science.gov (United States)

    Romanitan, Cosmin

    2017-12-01

    A simple model that establishes a quantitative measure for the positional correlation degree of threading dislocations (TDs) in heteroepitaxial layers is proposed. Accordingly, analyzing the linewidth of the Gaussian fit that follows the experimental rocking curve (RC), we obtained the correlation degree of screw and edge TDs in GaN epitaxial layers grown on sapphire substrate. Calculating the numerical integral using both the standard Wilkens correlation parameter, M, and the new one, S, and comparing the numerical results with the experimental diffraction patterns for three samples of GaN epitaxial films with different thicknesses, we demonstrate that the newly determined correlation parameter is correct.

  20. High breakdown single-crystal GaN p-n diodes by molecular beam epitaxy

    Science.gov (United States)

    Qi, Meng; Nomoto, Kazuki; Zhu, Mingda; Hu, Zongyang; Zhao, Yuning; Protasenko, Vladimir; Song, Bo; Yan, Xiaodong; Li, Guowang; Verma, Jai; Bader, Samuel; Fay, Patrick; Xing, Huili Grace; Jena, Debdeep

    2015-12-01

    Molecular beam epitaxy grown GaN p-n vertical diodes are demonstrated on single-crystal GaN substrates. A low leakage current GaN. Single-crystal GaN substrates with very low dislocation densities enable the low leakage current and the high breakdown field in the diodes, showing significant potential for MBE growth to attain near-intrinsic performance when the density of dislocations is low.

  1. Raman study of collective plasmon-longitudinal optical phonon excitations in cubic GaN and AlxGa1-xN epitaxial layers

    Science.gov (United States)

    Pusep, Yu. A.; Silva, M. T. O.; Fernandez, J. R. L.; Chitta, V. A.; Leite, J. R.; Frey, T.; As, D. J.; Schikora, D.; Lischka, K.

    2002-05-01

    The plasmon-longitudinal optical (LO) phonon collective excitations were studied by Raman scattering in cubic GaN doped with Si and in intrinsically doped cubic AlxGa1-xN alloys. The specific asymmetry of the corresponding Raman lines, associated with the dispersion of the coupled excitations was clearly detected in GaN. The spatial coherence of the relevant coupled oscillations was determined from the comparison of the experimental Raman spectra with the calculated ones. A broad line, which was previously attributed to the overdamped plasmon-LO phonon oscillations, was also observed in the GaN and AlxGa1-xN samples in the range between the transversal optical and LO phonon frequencies.

  2. Lattice-Symmetry-Driven Epitaxy of Hierarchical GaN Nanotripods

    KAUST Repository

    Wang, Ping

    2017-01-18

    Lattice-symmetry-driven epitaxy of hierarchical GaN nanotripods is demonstrated. The nanotripods emerge on the top of hexagonal GaN nanowires, which are selectively grown on pillar-patterned GaN templates using molecular beam epitaxy. High-resolution transmission electron microscopy confirms that two kinds of lattice-symmetry, wurtzite (wz) and zinc-blende (zb), coexist in the GaN nanotripods. Periodical transformation between wz and zb drives the epitaxy of the hierarchical nanotripods with N-polarity. The zb-GaN is formed by the poor diffusion of adatoms, and it can be suppressed by improving the ability of the Ga adatoms to migrate as the growth temperature increased. This controllable epitaxy of hierarchical GaN nanotripods allows quantum dots to be located at the phase junctions of the nanotripods and nanowires, suggesting a new recipe for multichannel quantum devices.

  3. Thin-film GaN Schottky diodes formed by epitaxial lift-off

    Science.gov (United States)

    Wang, Jingshan; Youtsey, Chris; McCarthy, Robert; Reddy, Rekha; Allen, Noah; Guido, Louis; Xie, Jinqiao; Beam, Edward; Fay, Patrick

    2017-04-01

    The performance of thin-film GaN Schottky diodes fabricated using a large-area epitaxial lift-off (ELO) process is reported in this work. Comparison of the device characteristics before and after lift-off processing reveals that the Schottky barrier height remains unchanged by the liftoff processing and is consistent with expectations based on metal-semiconductor work function differences, with a barrier height of approximately 1 eV obtained for Ni/Au contacts on n- GaN. However, the leakage current in both reverse and low-forward-bias regimes is found to improve significantly after ELO processing. Likewise, the ideality factor of the Schottky diodes also improves after ELO processing, decreasing from n = 1.12-1.18 before ELO to n = 1.04-1.10 after ELO. A possible explanation for the performance improvement obtained for Schottky diodes after substrate removal by ELO processing is the elimination of leakage paths consisting of vertical leakage along threading dislocations coupled with lateral conduction through the underlying n+ buffer layer that is removed in the ELO process. Epitaxial liftoff with GaN may enable significant improvement in device performance and economics for GaN-based electronics and optoelectronics.

  4. MgO epitaxy on GaN (0002) surfaces by molecular beam epitaxy

    Science.gov (United States)

    Craft, H. S.; Ihlefeld, J. F.; Losego, M. D.; Collazo, R.; Sitar, Z.; Maria, J.-P.

    2006-05-01

    We report on the epitaxial deposition of magnesium oxide films with [111] crystallographic orientation on (0002) GaN by molecular beam epitaxy. Specifically, we use an adsorption controlled growth mechanism to initiate the growth process. Electron diffraction shows a spotty intense pattern without intensity fluctuations during growth and evidence of in-plane twinning. X-ray diffraction reveals the films to be epitaxial with full width at half maximum values of 0.3°, 0.5°, and 1° in 2θ, ϕ, and χ circles, respectively. Wet etching of the GaN surface with a HCl:HF mixture prior to growth is critical for achieving high crystalline quality. Epitaxial growth is observed between room temperature and 650°C, with negligible changes in crystalline quality with increased temperature. Atomic force microscopy analysis shows grainy surfaces with feature sizes near 10nm and rms roughness values of 1.4Å over 1μm2 areas. X-ray diffraction analysis suggests MgO film stability up to 850°C in ex situ air annealing.

  5. Helical-type surface defects in GaN thin films epitaxially grown on GaN templates at reduced temperatures

    Science.gov (United States)

    Miraglia, P. Q.; Preble, E. A.; Roskowski, A. M.; Einfeldt, S.; Davis, R. F.

    2003-06-01

    Surface pits in the form of v-shaped defects and resulting surface roughening, previously associated solely with InGaN films, were observed and investigated using atomic force microscopy on GaN films grown at 780°C via metalorganic vapor phase epitaxy on conventionally and pendeo-epitaxially deposited GaN thin film templates. The density of the v-shaped defects was similar to the density of threading dislocations of ˜3×10 9 cm -2 (that originate from the heteroepitaxial interface between the GaN template layer and the SiC substrate). Moreover, the v-defect density was diminished with decreases in the dislocation density via increases in the template layer thickness or the use of pendeo-epitaxial seed layers. A concomitant reduction in the full-width half-maxima of the X-ray rocking curves was also observed. A qualitative model is presented that describes the formation of v-shaped defects as a result of interactions between the movement of surface steps, screw-type dislocation cores, and clusters of atoms on the terraces that form under conditions of high surface undercooling.

  6. Halogen-free vapor phase epitaxy for high-rate growth of GaN bulk crystals

    Science.gov (United States)

    Nakamura, Daisuke; Kimura, Taishi; Horibuchi, Kayo

    2017-04-01

    Here, we propose a halogen-free vapor phase epitaxy (HF-VPE) technique to grow bulk GaN single crystals. This technique employs the simplest reaction for GaN synthesis (reaction of Ga vapor with NH3) and can potentially achieve a high growth rate, a prolonged growth duration, a high crystal quality, and a low cost. The analyses of thick HF-VPE-GaN layers grown under optimized growth conditions revealed that high-quality crystals, both in terms of dislocation density and impurity concentration, are obtained at high growth rates of over 100 µm/h.

  7. Development of Epitaxial GaN Films for RF Communications Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The primary objective of this SBIR is to develop epitaxial GaN films with threading dislocation density less than 10^6 cm^-2. We propose an innovative approach...

  8. Void Shapes Controlled by Using Interruption-Free Epitaxial Lateral Overgrowth of GaN Films on Patterned SiO2 AlN/Sapphire Template

    OpenAIRE

    Yu-An Chen; Cheng-Huang Kuo; Li-Chuan Chang; Ji-Pu Wu

    2014-01-01

    GaN epitaxial layers with embedded air voids grown on patterned SiO2 AlN/sapphire templates were proposed. Using interruption-free epitaxial lateral overgrowth technology, we realized uninterrupted growth and controlled the shape of embedded air voids. These layers showed improved crystal quality using X-ray diffraction and measurement of etching pits density. Compared with conventional undoped-GaN film, the full width at half-maximum of the GaN (0 0 2) and (1 0 2) peaks decreased from 485 ar...

  9. Microstructure evolution of GaN buffer layer on MgAl 2O 4 substrate

    Science.gov (United States)

    Yang, H.-F.; Han, P.-D.; Cheng, L.-S.; Zhang, Z.; Duan, S.-K.; Teng, X.-G.

    1998-10-01

    Microstructure of GaN buffer layer grown on (1 1 1)MgAl 2O 4 substrate by metalorganic vapor phase epitaxy (MOVPE) was studied by transmission electron microscopy (TEM). It has been observed that the early deposition of GaN buffer layer on the substrate at a relatively low temperature formed a continual island-sublayer (5 nm thick) with hexagonal crystallographic structure, and the subsequent GaN buffer deposition led to crystal columns which are composed of nano-crystal slices with mixed cubic and hexagonal phases. After high-temperature annealing, the crystallinity of nano-crystal slices and island-sublayer in the buffer layer have been improved. The formation of threading dislocations in the GaN film is attributed not only to the lattice mismatch of GaN/MgAl 2O 4 interface, but also to the stacking mismatches at the crystal column boundaries.

  10. Polarized infrared reflectance study of free standing cubic GaN grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Lee, S.C., E-mail: saicheonglee86@yahoo.com [Nano-Optoelectronics Research Laboratory, School of Physics, Universiti Sains Malaysia, 11800 Penang (Malaysia); Department of Physics, Faculty of Science, University of Malaya, 50603 Kuala Lumpur (Malaysia); Ng, S.S.; Hassan, H. Abu; Hassan, Z.; Zainal, N. [Nano-Optoelectronics Research Laboratory, School of Physics, Universiti Sains Malaysia, 11800 Penang (Malaysia); Novikov, S.V.; Foxon, C.T.; Kent, A.J. [School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD (United Kingdom)

    2014-07-01

    Optical properties of free standing cubic gallium nitride grown by molecular beam epitaxy system are investigated by a polarized infrared (IR) reflectance technique. A strong reststrahlen band, which reveals the bulk-like optical phonon frequencies, is observed. Meanwhile, continuous oscillation fringes, which indicate the sample consists of two homogeneous layers with different dielectric constants, are observed in the non-reststrahlen region. By obtaining the first derivative of polarized IR reflectance spectra measured at higher angles of incidence, extra phonon resonances are identified at the edges of the reststrahlen band. The observations are verified with the theoretical results simulated based on a multi-oscillator model. - Highlights: • First time experimental studies of IR optical phonons in bulk like, cubic GaN layer. • Detection of extra phonon modes of cubic GaN by polarized IR reflectance technique. • Revelation of IR multiphonon modes of cubic GaN by first derivative numerical method. • Observation of multiphonon modes requires very high angle of incidence. • Resonance splitting effect induced by third phonon mode is a qualitative indicator.

  11. Large-area, laterally-grown epitaxial semiconductor layers

    Science.gov (United States)

    Han, Jung; Song, Jie; Chen, Danti

    2017-07-18

    Structures and methods for confined lateral-guided growth of a large-area semiconductor layer on an insulating layer are described. The semiconductor layer may be formed by heteroepitaxial growth from a selective growth area in a vertically-confined, lateral-growth guiding structure. Lateral-growth guiding structures may be formed in arrays over a region of a substrate, so as to cover a majority of the substrate region with laterally-grown epitaxial semiconductor tiles. Quality regions of low-defect, stress-free GaN may be grown on silicon.

  12. Pendeo-epitaxial growth of GaN on SiC and silicon substrates via metalorganic chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Linthicum, K.J.; Gehrke, T.; Thomson, D.; Ronning, C.; Carlson, E.P.; Zorman, C.A.; Mehregany, M.; Davis, R.F.

    1999-07-01

    Pendeo-epitaxial lateral growth (PE) of GaN epilayers on (0001) 6H-silicon carbide and (111) Si substrates has been achieved. Growth on the latter substrate was accomplished through the use of a 3C-SiC transition layer. The coalesced PE GaN epilayers were characterized using scanning electron diffraction, x-ray diffraction and photoluminescence spectroscopy. The regions of lateral growth exhibited {approximately} 0.2{degree} crystallographic tilt relative to the seed layer. The GaN seed and PE epilayers grown on the 3C-SiC/Si substrates exhibited comparable optical characteristics to the GaN seed and PE grown on 6H-SiC substrates. The near band-edge emission of the GaN/3C-SiC/Si seed was 3.450 eV (FWHM {approximately} 19 meV) and the GaN/6H-SiC seed was 3.466 eV (FWHM {approximately} 4 meV).

  13. Epitaxial growth of M-plane GaN on ZnO micro-rods by plasma-assisted molecular beam epitaxy

    Science.gov (United States)

    You, Shuo-Ting; Lo, Ikai; Tsai, Jenn-Kai; Shih, Cheng-Hung

    2015-12-01

    We have studied the GaN grown on ZnO micro-rods by plasma-assisted molecular beam epitaxy. From the analyses of GaN microstructure grown on non-polar M-plane ZnO surface ( 10 1 ¯ 0 ) by scanning transmission electron microscope, we found that the ZnGa2O4 compound was formed at the M-plane hetero-interface, which was confirmed by polarization-dependent photoluminescence. We demonstrated that the M-plane ZnO micro-rod surface can be used as an alternative substrate to grow high quality M-plane GaN epi-layers.

  14. Epitaxial growth of M-plane GaN on ZnO micro-rods by plasma-assisted molecular beam epitaxy

    Directory of Open Access Journals (Sweden)

    Shuo-Ting You

    2015-12-01

    Full Text Available We have studied the GaN grown on ZnO micro-rods by plasma-assisted molecular beam epitaxy. From the analyses of GaN microstructure grown on non-polar M-plane ZnO surface ( 10 1 ̄ 0 by scanning transmission electron microscope, we found that the ZnGa2O4 compound was formed at the M-plane hetero-interface, which was confirmed by polarization-dependent photoluminescence. We demonstrated that the M-plane ZnO micro-rod surface can be used as an alternative substrate to grow high quality M-plane GaN epi-layers.

  15. Void Shapes Controlled by Using Interruption-Free Epitaxial Lateral Overgrowth of GaN Films on Patterned SiO2 AlN/Sapphire Template

    Directory of Open Access Journals (Sweden)

    Yu-An Chen

    2014-01-01

    Full Text Available GaN epitaxial layers with embedded air voids grown on patterned SiO2 AlN/sapphire templates were proposed. Using interruption-free epitaxial lateral overgrowth technology, we realized uninterrupted growth and controlled the shape of embedded air voids. These layers showed improved crystal quality using X-ray diffraction and measurement of etching pits density. Compared with conventional undoped-GaN film, the full width at half-maximum of the GaN (0 0 2 and (1 0 2 peaks decreased from 485 arcsec to 376 arcsec and from 600 arcsec to 322 arcsec, respectively. Transmission electron microscopy results showed that the coalesced GaN growth led to bending threading dislocation. We also proposed a growth model based on results of scanning electron microscopy.

  16. GaN nano-pendeo-epitaxy on Si(111) substrates

    Energy Technology Data Exchange (ETDEWEB)

    Liu, Chaowang; Wang, Wang Nang; Denchitcharoen, Somyod; Gott, Alan; Shields, Philip A.; Allsopp, Duncan W.E. [Department of Electronic and Electrical Engineering, University of Bath, BA2 7AY (United Kingdom)

    2009-06-15

    Nano-pendeo-epitaxial GaN films have been grown by metalorganic vapour phase epitaxy on nanocolumns fabricated on thin GaN-on-Si(111) templates. Optical and structural performances of the films are improved, crack densities are reduced, and self-separation of GaN films from the substrates at the nanocolumns has been realized. The success of the nano-pendeo-epitaxy of GaN films is attributed to the following three techniques developed in this study: (1) the growth of high quality ultrathin GaN/AlN templates on on Si(111) substrates, (2) the fabrication of uniform nanocolumns across the 2-inch wafer surface, and (3) the in situ conversion of the exposed silicon surfaces of the fabricated nanocolumns to silicon nitride. (copyright 2009 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  17. Mapping misorientation and crystallographic tilt in GaN layers via polychromatic microdiffraction

    Science.gov (United States)

    Barabash, R. I.; Ice, G. E.; Liu, W.; Roder, C.; Figge, S.; Einfeldt, S.; Hommel, D.; Katona, T. M.; Speck, J. S.; Denbaars, S. P.; Davis, R. F.

    The spatial distribution of strain, dislocations, and crystallographic orientation in uncoalesced and coalesced GaN layers grown on striped Si or SiC substrates was studied by polychromatic X-ray microdiffraction and high resolution monochromatic X-ray diffraction. Tilt boundaries formed at the column/wing interface depending on the growth conditions and geometry of the striped substrate. The measurements revealed that the free-hanging wings are tilted upward at room temperature. A misorientation between the GaN(0001) and the Si(111) or SiC(0001) surface normal is observed. Distinct structural properties of the pendeo and cantilever epitaxially grown samples are discussed.

  18. The structure of InAlGaN layers grown by metal organic vapour phase epitaxy: effects of threading dislocations and inversion domains from the GaN template.

    Science.gov (United States)

    Ben Ammar, H; Minj, A; Chauvat, M-P; Gamarra, P; Lacam, C; Morales, M; Ruterana, P

    2017-12-01

    Defects in quaternary InAlGaN barriers and their effects on crystalline quality and surface morphology have been studied. In addition to growth conditions, the quality of the GaN template may play an important role in the formation of defects in the barrier. Therefore, this work is focused on effects caused by threading dislocations (TDs) and inversion domains (IDs) originating from the underlying GaN. The effects are observed on the crystalline quality of the barrier and characteristic surface morphologies. Each type of TDs is shown to affect the surface morphology in a different way. Depending on the size of the corresponding hillock for a given pinhole, it was possible to determine the dislocation type. It is pointed out that the smallest pinholes are not connected to TDs whereas the large ones terminate either mixed type or edge type TDs. At sufficiently large layer thickness, the IDs originating from the GaN template lead to the formation of concentric trenches at the layer surface, and this is related to the change in growth kinetics on top and at the immediate surroundings of the ID. © 2017 The Authors Journal of Microscopy © 2017 Royal Microscopical Society.

  19. Effect of H, O intentionally doping on photoelectric properties in MOVPE-growth GaN layers

    KAUST Repository

    Ohkawa, Kazuhiro

    2017-10-24

    GaN crystal growth requires higher purity of materials. Some contaminants in NH3 gas could be the causal factor of defects in GaN crystals. These atoms act as donor or acceptor. In order to clearly demonstrate the effect of gaseous impurities such as H2O on the properties of undoped-GaN layer, high purity NH3 (N70) was used as NH3 source. The concentration of H2O in NH3 was varied at 32, 49, 75, 142, 266, 489, and 899 ppb, respectively. Under the same recipe, we deposited undoped-GaN epitaxial layer with purifier, and H2O-doped GaN series layers. As similar to the results of CO and CO2-doped GaN series, the increase tendency of carrier density changing with increasing H2O concentration. The FWHMs of XRC around (0002) remain stable, witnessing that the crystal quality of GaN layer remain good. LT (15K) PL of undoped-GaN and H2O-doped GaN were measured, the D0X emission peak intensity of all H2O-doped GaN are decreased drastically compared with undoped-GaN. H2O impurity was doped into GaN layer, which not only effects electrical properties and but also effects the radiative emission and furthermore effects PL intensity, its mechanism is discussed.

  20. A partly-contacted epitaxial lateral overgrowth method applied to GaN material

    Science.gov (United States)

    Xiao, Ming; Zhang, Jincheng; Duan, Xiaoling; Shan, Hengsheng; Yu, Ting; Ning, Jing; Hao, Yue

    2016-04-01

    We have discussed a new crystal epitaxial lateral overgrowth (ELO) method, partly-contacted ELO (PC-ELO) method, of which the overgrowth layer partly-contacts with underlying seed layer. The passage also illustrates special mask structures with and without lithography and provides three essential conditions to achieve the PC-ELO method. What is remarkable in PC-ELO method is that the tilt angle of overgrowth stripes could be eliminated by contacting with seed layer. Moreover, we report an improved monolayer microsphere mask method without lithography of PC-ELO method, which was used to grow GaN. From the results of scanning electron microscopy, cathodoluminescence, x-ray diffraction (XRD), transmission electron microscopy, and atomic force microscope (AFM), overgrowth layer shows no tilt angle relative to the seed layer and high quality coalescence front (with average linear dislocation density <6.4 × 103 cm-1). Wing stripes peak splitting of the XRD rocking curve due to tilt is no longer detectable. After coalescence, surface steps of AFM show rare discontinuities due to the low misorientation of the overgrowth regions.

  1. Low-temperature growth of AlN and GaN by metal organic vapor phase epitaxy for polarization engineered water splitting photocathode

    Science.gov (United States)

    Nakamura, Akihiro; Suzuki, Michihiro; Fujii, Katsushi; Nakano, Yoshiaki; Sugiyama, Masakazu

    2017-04-01

    Crystal properties of low-temperature grown AlN (LT-AlN) combined with low temperature GaN (LT-GaN) grown by metal organic vapor phase epitaxy (MOVPE) were investigated to obtain a high quality GaN/AlN/GaN structure with a few-nm-thick AlN layer. LT-AlN suppresses unintentional Ga incorporation and can be pseudomorphically grown on GaN with a relatively smooth surface morphology. The lattice of LT-AlN coherent to GaN, however, was found to relax after reactor conditions were changed to grow the subsequent GaN layer at higher temperature. The top GaN layer grown on the relaxed LT-AlN, thus, exhibited a rough surface morphology and a threading dislocation density (TDD) higher than 109 cm-2 estimated from an X-ray diffraction measurement. An LT-GaN capping layer was found to be highly effective for avoiding such lattice relaxation of LT-AlN. The combination of LT-AlN and LT-GaN enables us to obtain a GaN/AlN/GaN junction with high Al content, a low TDD, and abrupt interfaces. As a result, introducing an LT-GaN layer improved the photoelectrochemical (PEC) property of a polarization engineered un-doped GaN/AlN/n-type GaN (u-GaN/AlN/n-GaN) photocathode for water splitting.

  2. Lattice kinetic Monte Carlo simulation study of the early stages of epitaxial GaN(0001) growth

    Science.gov (United States)

    Chugh, Manjusha; Ranganathan, Madhav

    2017-11-01

    The early stages of GaN(0001) epitaxial growth are modeled using a lattice-based kinetic Monte Carlo simulation. The simulation explicitly includes both the constituent atoms and is performed on the wurtzite crystal structure of GaN. The deposition flux is chosen to mimic conditions in a molecular beam epitaxy chamber. The surface diffusion barriers used for the growth simulation are obtained from ab initio density functional theory based calculations. The evolution of submonolayer islands from small random clusters to ordered triangular islands is captured in these simulations. Further the submonolayer island density statistics is calculated to illustrate standard scaling behavior. The island density as a function of coverage is used to show the different regimes of submonolayer growth and the transition to multi-layer growth. The island density dependence on deposition flux, Ga:N flux ratio, and temperature are also shown to be reasonable and consistent with experiments. We further highlight the importance of N-rotation, which is a diffusion mechanism for nitrogen adatoms under moderate gallium excess.

  3. Growth study of self-assembled GaN nanocolumns on silica glass by plasma assisted molecular beam epitaxy

    Science.gov (United States)

    Liudi Mulyo, Andreas; Konno, Yuta; Nilsen, Julie S.; van Helvoort, Antonius T. J.; Fimland, Bjørn-Ove; Weman, Helge; Kishino, Katsumi

    2017-12-01

    We demonstrate GaN nanocolumn growth on fused silica glass by plasma-assisted molecular beam epitaxy. The effect of the substrate temperature, Ga flux and N2 flow rate on the structural and optical properties are studied. At optimum growth conditions, GaN nanocolumns are vertically aligned and well separated with an average diameter, height and density of 72 nm, 1.2 μm and 1.6 × 109 cm-2, respectively. The nanocolumns exhibit wurtzite crystal structure with no threading dislocations, stacking faults or twinning and grow in the [0 0 0 1] direction. At the interface adjacent to the glass, there is a few atom layers thick intermediate phase with ABC stacking order (zinc blende). Photoluminescence measurements evidence intense and narrow excitonic emissions, along with the absence of any defect-related zinc blende and yellow luminescence emission.

  4. Pendeo-epitaxial growth and characterization of GaN and related materials on 6H-SiC(0001) and Si(111) substrates

    Energy Technology Data Exchange (ETDEWEB)

    Davis, R.F.; Gehrke, T.; Linthicum, K.J.; Zheleva, T.S.; Rajagopal, P.; Zorman, C.A.; Mehregany, M.

    2000-07-01

    Discrete and coalesced monocrystalline GaN and Al{sub x}Ga{sub 1{minus}x}N layers grown via Pendeo-epitaxy (PE) [1] originated from side walls of GaN seed structures containing SiN{sub x} top masks have been grown via organometallic vapor phase deposition on GaN/AlN/6H-SiC(0001) and GaN(0001)/AlN(0001)/3C-SiC(111)/Si(111) substrates. Scanning and transmission electron microscopies were used to evaluate the external microstructures and the distribution of dislocations, respectively. The dislocation densities in the PE grown films was reduced by at least five orders of magnitude relative to the initial GaN seed layers. Tilting in the coalesced GaN epilayers was observed via X-ray diffraction. A tilt of 0.2{degree} was confined to areas of mask overgrowth; however, no tilting was observed in the material suspended above the SiC substrate. The strong, low-temperature PL band-edge peak at 3.45 eV with a FWHM of 17 meV was comparable to that observed in PE GaN films grown on 6H-SiC(0001). The band-edge in the GaN grown on AlN(0001)/SiC(111)Si(111) substrates was shifted to a lower energy by 10 meV, indicative of a greater tensile stress.

  5. Micro-Raman and electron microscopy analysis of cubic GaN layers on (001) GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Tabata, A.; Enderlein, R.; Lima, A.P.; Leite, J.R. [Sao Paulo Univ. (Brazil). Inst. de Fisica; Lemos, V. [Inst. de Fisica, Univ. Estadual de Campinas (Brazil); Kaiser, S. [Festkoerperphysik, Univ. Regensburg (Germany); Schikora, D.; Schoettker, B.; Koehler, U.; Lischka, K. [Paderborn Univ. (Gesamthochschule) (Germany). Fachbereich 6 - Physik

    1998-08-01

    Cubic GaN layers are grown by molecular beam epitaxy on (001) GaAs substrates. The influence of intentional deviations from stoichiometric growth conditions on the structural homogeneity of the epitaxial layers is studied. Optical micrographs of the epilayers grown at Ga-excess reveal the existence of microcrystalline inclusions such as bright rectangular structures, dark dots surrounded by rectangles, and dark dots without rectangles. Micro-Raman spectroscopy is used to study the structural properties of these inclusions and of the epilayers in greater detail. We find that the dots are GaN microcrystals of either hexagonal structure or of cubic structure. The rectangles are GaN regions of cubic structure like the epilayer itself. (orig.) 9 refs.

  6. MOVPE growth of GaN on 6-inch SOI-substrates: effect of substrate parameters on layer quality and strain

    Science.gov (United States)

    Lemettinen, J.; Kauppinen, C.; Rudzinski, M.; Haapalinna, A.; Tuomi, T. O.; Suihkonen, S.

    2017-04-01

    We demonstrate that higher crystalline quality, lower strain and improved electrical characteristics can be achieved in gallium nitride (GaN) epitaxy by using a silicon-on-insulator (SOI) substrate compared to a bulk silicon (Si) substrate. GaN layers were grown by metal-organic vapor phase epitaxy on 6-inch bulk Si and SOI wafers using the standard step graded AlGaN and AlN approach. The GaN layers grown on SOI exhibited lower strain according to x-ray diffraction analysis. Defect selective etching measurements suggested that the use of SOI substrate for GaN epitaxy reduces the dislocation density approximately by a factor of two. Furthermore, growth on SOI substrate allows one to use a significantly thinner AlGaN buffer compared to bulk Si. Synchrotron radiation x-ray topography analysis confirmed that the stress relief mechanism in GaN on SOI epitaxy is the formation of a dislocation network to the SOI device Si layer. In addition, the buried oxide layer significantly improves the vertical leakage characteristics as the onset of the breakdown is delayed by approximately 400 V. These results show that the GaN on the SOI platform is promising for power electronics applications.

  7. Electron microscopy studies of the intermediate layers at the SiO2/GaN interface

    Science.gov (United States)

    Mitsuishi, Kazutaka; Kimoto, Koji; Irokawa, Yoshihiro; Suzuki, Taku; Yuge, Kazuya; Nabatame, Toshihide; Takashima, Shinya; Ueno, Katsunori; Edo, Masaharu; Nakagawa, Kiyokazu; Koide, Yasuo

    2017-11-01

    As the first step toward understanding the electrical properties of SiO2/GaN systems, the interface was characterized using high-resolution scanning transmission electron microscopy (STEM) and energy dispersive X-ray spectroscopy (EDS). An epitaxial crystalline intermediate layer with a thickness of ∼1.5 nm was observed at the SiO2/GaN interface. STEM-EDS analyses revealed that this intermediate layer contained gallium and oxygen and mostly comprised the ε-Ga2O3 phase. The ε-Ga2O3/GaN interface was atomically smooth and free from misfit dislocations despite lattice mismatch of ∼8.0%, suggesting that the initial oxidation of GaN surfaces is crucial to achieve good interfacial properties.

  8. Island dynamics and anisotropy during vapor phase epitaxy of m-plane GaN

    Energy Technology Data Exchange (ETDEWEB)

    Perret, Edith [Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA; University of Fribourg, Department of Physics and Fribourg Center for Nanomaterials, Chemin du Musée 3, CH-1700 Fribourg, Switzerland; Xu, Dongwei [Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA; Highland, M. J. [Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA; Stephenson, G. B. [Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA; Zapol, P. [Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA; Fuoss, P. H. [Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA; Munkholm, A. [Munkholm Consulting, Mountain View, California 94043, USA; Thompson, Carol [Department of Physics, Northern Illinois University, DeKalb, Illinois 60115, USA

    2017-12-04

    Using in situ grazing-incidence x-ray scattering, we have measured the diffuse scattering from islands that form during layer-by-layer growth of GaN by metal-organic vapor phase epitaxy on the (1010) m-plane surface. The diffuse scattering is extended in the (0001) in-plane direction in reciprocal space, indicating a strong anisotropy with islands elongated along [1210] and closely spaced along [0001]. This is confirmed by atomic force microscopy of a quenched sample. Islands were characterized as a function of growth rate F and temperature. The island spacing along [0001] observed during the growth of the first monolayer obeys a power-law dependence on growth rate F-n, with an exponent n = 0:25 + 0.02. The results are in agreement with recent kinetic Monte Carlo simulations, indicating that elongated islands result from the dominant anisotropy in step edge energy and not from surface diffusion anisotropy. The observed power-law exponent can be explained using a simple steady-state model, which gives n = 1/4.

  9. Selectively Enhanced UV-A Photoresponsivity of a GaN MSM UV Photodetector with a Step-Graded AlxGa1−xN Buffer Layer

    Directory of Open Access Journals (Sweden)

    Chang-Ju Lee

    2017-07-01

    Full Text Available The UV-to-visible rejection ratio is one of the important figure of merits of GaN-based UV photodetectors. For cost-effectiveness and large-scale fabrication of GaN devices, we tried to grow a GaN epitaxial layer on silicon substrate with complicated buffer layers for a stress-release. It is known that the structure of the buffer layers affects the performance of devices fabricated on the GaN epitaxial layers. In this study, we show that the design of a buffer layer structure can make effect on the UV-to-visible rejection ratio of GaN UV photodetectors. The GaN photodetector fabricated on GaN-on-silicon substrate with a step-graded AlxGa−xN buffer layer has a highly-selective photoresponse at 365-nm wavelength. The UV-to-visible rejection ratio of the GaN UV photodetector with the step-graded AlxGa1−xN buffer layer was an order-of-magnitude higher than that of a photodetector with a conventional GaN/AlN multi buffer layer. The maximum photoresponsivity was as high as 5 × 10−2 A/W. This result implies that the design of buffer layer is important for photoresponse characteristics of GaN UV photodetectors as well as the crystal quality of the GaN epitaxial layers.

  10. Large area lateral epitaxial overgrowth (LEO) of gallium nitride (GAN) thin films on silicon substrates and their characterization. Final report 1 March--30 September 99

    Energy Technology Data Exchange (ETDEWEB)

    Davis, R.F.; Linthicum, K.J.; Gehrke, T.; Thomson, D.; Ronning, C.

    1999-09-01

    Pendeo-epitaxial lateral growth (PE) of GaN epilayers on (0001) 6H-silicon carbide and (111) Si substrates has been achieved. Growth on the latter substrate was accomplished through the use of a 3C-SiC transition layer. The coalesced PE GaN epilayers were characterized using scanning electron diffraction, x-ray diffraction and photoluminescence spectroscopy. The regions of lateral growth exhibited {approximately} 0.2 deg crystallographic tilt relative to the seed layer. The GaN seed and PE epilayers grown on the 3C-SiC/Si substrates exhibited comparable optical characteristics to the GaN seed and PE grown on 6H- SiC substrates. The near band-edge emission of the GaN/3C-SiC/Si seed was 3.450 eV (FWHM approx. 19 meV) and the GaN/6H-SiC seed was 3.466 eV (FWHM approx. 4 meV).

  11. p-type GaN grown by phase shift epitaxy

    Science.gov (United States)

    Zhong, M.; Roberts, J.; Kong, W.; Brown, A. S.; Steckl, A. J.

    2014-01-01

    Phase shift epitaxy (PSE) is a periodic growth scheme, which desynchronizes host material growth process from dopant incorporation, allowing independent optimization. p-type doping of GaN with Mg by PSE is accomplished with molecular beam epitaxy by periodic shutter action (in order to iterate between Ga- and N-rich surface conditions) and by adjusting time delays between dopant and Ga shutters. Optimum PSE growth was obtained by turning on the Mg flux in the N-rich condition. This suppresses Mg self-compensation at high Mg concentration and produces fairly high hole concentrations (2.4 × 1018 cm-3).

  12. Epitaxial Growth of Single Crystalline GaN Nanowires on (0001) Al2O3

    Science.gov (United States)

    Kehagias, Th; Komninou, Ph; Dimitrakopulos, G. P.; Sahonta, S.-L.; Chèze, C.; Geelhaar, L.; Riechert, H.; Karakostas, Th

    Well-aligned single crystalline GaN nanowires were epitaxially grown on Al2O3 by molecular beam epitaxy. Controlled growth of the nanowires is achieved by tuning the V/III ratio during growth. Oxidised single crystalline catalyst droplets of a cubic symmetry are observed on the top surface of the nanowires. Adaptation of the cubic lattice on the wurtzite tip is realized via the introduction of a dense network of misfit dislocations at the interface. The {100} lattice spacing of the oxide droplets is found to be very close to its strain-free value, indicating almost full relaxation by the misfit dislocation network.

  13. Dislocation reduction in GaN epilayers by maskless Pendeo-epitaxy process

    Energy Technology Data Exchange (ETDEWEB)

    Park, Dong Jun; Lee, Jeong Yong [Korea Advanced Institute of Science and Technology, Daejeon (Korea, Republic of); Cho, Hyung Koun [Dong-A University, Busan (Korea, Republic of); Hong, Chang Hee; Cheong, Hung Seob [Chonbuk National University, Chonju (Korea, Republic of)

    2004-11-15

    Facet structures of GaN grown by the Pendeo-epitaxy (PE) process with low-pressure metalorganic chemical vapor deposition (LP-MOCVD) are controlled by growth temperature. PE growth without the use of a mask, termed 'maskless' PE, was performed to reduce crystallographic tilt and to eliminate a source of impurities in the overgrowth material. Tilting behavior and crystalline properties, which were investigated from the result of (0002) X-ray diffraction rocking curves taken perpendicular and parallel to the seed stripe direction, can be improved with high growth temperature. The propagation mechanism of the threading dislocations in the different GaN facet structures is investigated by transmission electron microscopy (TEM). Two-step growth in the PE process is proposed; in this technique, bending of threading dislocations due to facet structure is observed. The two-step growth process shows much lower dislocation density and better crystal quality than conventional maskless PE GaN.

  14. Structural Defects in Laterally Overgrown GaN Layers Grown onNon-polar Substrates

    Energy Technology Data Exchange (ETDEWEB)

    Liliental-Weber, Z.; Ni, X.; Morkoc, H.

    2007-02-14

    Transmission electron microscopy was used to study defects in lateral epitaxial layers of GaN which were overgrown on a template of a-plane (11{und 2}0) GaN grown on (1{und 1}02) r-plane Al2O3. A high density of basal stacking faults is formed in these layers because the c-planes of wurtzite structure are arranged along the growth direction. Density of these faults is decreasing at least by two orders of magnitude lower in the wings compared to the seed areas. Prismatic stacking faults and threading dislocations are also observed, but their densities drastically decrease in the wings. The wings grow with opposite polarities and the Ga-wing width is at least 6 times larger than N-wing and coalescence is rather difficult. Some tilt and twist was detected using Large Angle Convergent Beam Electron Diffraction.

  15. Characterization of growth defects in thin GaN layers with X-ray microbeam

    Energy Technology Data Exchange (ETDEWEB)

    Barabash, R.I.; Ice, G.E.; Budai, J. [Materials Science and Technology Div., Oak Ridge National Laboratory, Oak Ridge, TN, 37831 (United States); Roder, C.; Figge, S.; Einfeldt, S.; Hommel, D. [Institute of Solid State Physics, University of Bremen, P.O. Box 330 440, 28334 Bremen (Germany); Liu, W. [Advanced Photon Source, Argonne IL (United States); Davis, R.F. [Materials Science and Engineering Department, North Carolina State University, Raleigh (United States)

    2007-05-15

    The spatially resolved distribution of strain, misfit and threading dislocations, and crystallographic orientation in uncoalesced GaN layers grown on Si(111) by maskless cantilever epitaxy or by pendeo epitaxy on SiC was studied by white beam Laue X-ray microdiffraction, scanning electron and orientation imaging microscopy. Tilt boundaries formed at the column/wing interface depending on the growth conditions. A depth dependent deviatoric strain gradient is found in the GaN. The density of misfit dislocations as well as their arrangement within different dislocation arrays was quantified. Two different kinds of tilt (parallel and perpendicular to the stripe direction) manifested themselves by mutually orthogonal displacements of the (0006) GaN Laue spot relative to the Si(444) Laue spot. The origin of the tilts is discussed with respect to the miscut of the Si(111) surface and misfit dislocations formed at the interface. Regular oscillations of the conventional wing tilt were observed. Irregular crystallographic tilts fluctuations were found in the direction parallel to stripes. The amplitude of fluctuations is an order of magnitude smaller for layers with a lower defects density. (copyright 2007 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  16. Characterization of growth defects in thin GaN layers with X-ray microbeam.

    Energy Technology Data Exchange (ETDEWEB)

    Barabash, R .I.; Ice, G. E.; Roder, C.; Budai, J.; LIu, W.; Figge, S.; Einfeldt, S.; Hommel, D.; Davis, R. F.; ORNL; Univ. of Bremen; North Carolina State Univ.

    2007-04-02

    The spatially resolved distribution of strain, misfit and threading dislocations, and crystallographic orientation in uncoalesced GaN layers grown on Si(111) by maskless cantilever epitaxy or by pendeo epitaxy on SiC was studied by white beam Laue X-ray microdiffraction, scanning electron and orientation imaging microscopy. Tilt boundaries formed at the column/wing interface depending on the growth conditions. A depth dependent deviatoric strain gradient is found in the GaN. The density of misfit dislocations as well as their arrangement within different dislocation arrays was quantified. Two different kinds of tilt (parallel and perpendicular to the stripe direction) manifested themselves by mutually orthogonal displacements of the (0006) GaN Laue spot relative to the Si(444) Laue spot. The origin of the tilts is discussed with respect to the miscut of the Si(111) surface and misfit dislocations formed at the interface. Regular oscillations of the conventional wing tilt were observed. Irregular crystallographic tilts fluctuations were found in the direction parallel to stripes. The amplitude of fluctuations is an order of magnitude smaller for layers with a lower defects density.

  17. Characterization of Growth Defects in Thin GaN Layers with X-ray Microbeam

    Energy Technology Data Exchange (ETDEWEB)

    Barabash, Rozaliya [ORNL; Ice, Gene E [ORNL; Roder, C. [University of Bremen, Bremen, Germany; Budai, John D [ORNL; Liu, Wenjun [ORNL; Figge, S. [University of Bremen, Bremen, Germany; Einfeldt, S. [University of Bremen, Bremen, Germany; Hommel, D. [University of Bremen, Bremen, Germany; Davis, R. F. [North Carolina State University

    2007-01-01

    The spatially resolved distribution of strain, misfit and threading dislocations, and crystallographic orienta-tion in uncoalesced GaN layers grown on Si(111) by maskless cantilever epitaxy or by pendeo epitaxy on SiC was studied by white beam Laue x-ray microdiffraction, scanning electron and orientation imaging microscopy. Tilt boundaries formed at the column/wing interface depending on the growth conditions. A depth dependent deviatoric strain gradient is found in the GaN. Density of misfit dislocations as well as their arrangement within different dislocation arrays was quantified. Two different kinds of tilt (parallel and perpendicular to the stripe direction) manifested themselves by mutually orthogonal displacement of the (0006)GaN Laue spot relative to the Si (444) Laue spot. Origin of tilts is discussed with respect to the miscut of the Si(111) surface and misfit dislocations formed at the interface. Regular oscillations of the conventional wing tilt were observed. Irregular crystallographic tilts fluctuations were found in the direc-tion parallel to stripes. The amplitude of fluctuations is an order of magnitude smaller for layers with a lower defects density.

  18. MOCVD epitaxial growth of single crystal GaN, AlN and AlxGa1-xN

    Science.gov (United States)

    Matloubian, M.; Gershenzon, M.

    1985-09-01

    Ga begins to deposit from a stream of trimethylgallium (TMG) in H2 at a minimum temperature of 475‡C. Addition of sufficient amounts of NH2 results in the growth of textured polycrystalline GaN on basal plane sapphire substrates above 500‡C. A minimum temperature of 800‡C is required for the epitaxial growth of GaN on the substrate. Under similar conditions, but with the TMG replaced with trimethylaluminum (TMA), polycrystalline A1N begins forming at 400‡C (in the absence of NH3,, the TMA starts pyrolyzing at 300‡C), but single crystal growth of A1N requires a temperature of at least 1200‡C. Epitaxial single crystal layers of Alx Ga1-x N can be grown in the temperature range 800-1200‡C, tne minimum temperature being approximately proportional to x, but preferential deposition of A1N on the hot walls of the reactor (>400‡C) precludes precise control of the alloy composition. This predeposition of A1N can be retarded by keeping the walls below 400‡C by using a water-cooled jacket, by rapid flow-rates, or by injecting the TMA through a nozzle close to the surface of the substrate.

  19. Radiation-induced defects in GaN bulk grown by halide vapor phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Duc, Tran Thien; Pozina, Galia; Son, Nguyen Tien; Janzén, Erik; Hemmingsson, Carl [Department of Physics, Chemistry and Biology (IFM), Linköping University, S-581 83 Linköping (Sweden); Ohshima, Takeshi [Japan Atomic Energy Agency (JAEA), Takasaki, Gunma 370-1292 (Japan)

    2014-09-08

    Defects induced by electron irradiation in thick free-standing GaN layers grown by halide vapor phase epitaxy were studied by deep level transient spectroscopy. In as-grown materials, six electron traps, labeled D2 (E{sub C}–0.24 eV), D3 (E{sub C}–0.60 eV), D4 (E{sub C}–0.69 eV), D5 (E{sub C}–0.96 eV), D7 (E{sub C}–1.19 eV), and D8, were observed. After 2 MeV electron irradiation at a fluence of 1 × 10{sup 14 }cm{sup −2}, three deep electron traps, labeled D1 (E{sub C}–0.12 eV), D5I (E{sub C}–0.89 eV), and D6 (E{sub C}–1.14 eV), were detected. The trap D1 has previously been reported and considered as being related to the nitrogen vacancy. From the annealing behavior and a high introduction rate, the D5I and D6 centers are suggested to be related to primary intrinsic defects.

  20. Conventional and pendeo-epitaxial growth of GaN(0 0 0 1) thin films on Si(1 1 1) substrates

    Science.gov (United States)

    Davis, Robert F.; Gehrke, Thomas; Linthicum, Kevin J.; Preble, Edward; Rajagopal, Pradeep; Ronning, Carsten; Zorman, Christian; Mehregany, Mehran

    2001-10-01

    Single-crystal wurtzitic GaN(0 0 0 1) films have been grown via conventional methods on high-temperature AlN(0 0 0 1) buffer layers previously deposited on 3C-SiC(1 1 1)/Si(1 1 1) substrates using metal organic vapor phase epitaxy (MOVPE). Formation of the 3C-SiC transition layer employed a carburization step and the subsequent deposition of epitaxial 3C-SiC(1 1 1) on the Si(1 1 1) surface using atmospheric pressure chemical vapor deposition (APCVD) for both processes. Similar films, except with significantly reduced dislocation densities, have been grown via pendeo-epitaxy (PE) from the (1 1 2¯ 0) sidewalls of silicon nitride masked, raised, rectangular, and [1 1¯ 0 0] oriented GaN stripes etched from films conventionally grown on similarly prepared, Si-based, multilayer substrates. The FWHM of the (0 0 0 2) X-ray diffraction peak of the conventionally grown GaN was 1443 arcsec. The FWHM of the photoluminescence (PL) spectra for the near band-edge emission on these films was 19 meV. Tilting in the coalesced PE-grown GaN epilayers of 0.2° was confined to the areas of lateral overgrowth over the masks; no tilting was observed in the material suspended above the trenches. The strong, low-temperature PL band-edge peak at 3.456 eV with an FWHM of 17 meV in the PE films was comparable to that observed in PE GaN films grown on AlN/6H-SiC(0 0 0 1) substrates.

  1. Bulk GaN substrate with overall dislocation density on the order of 105/cm2 fabricated by hydride vapor phase epitaxy

    Science.gov (United States)

    Goubara, Shin; Matsubara, Tohoru; Yukizane, Kota; Arita, Naoki; Fujimoto, Satoru; Ezaki, Tatsuya; Inomoto, Ryo; Yamane, Keisuke; Okada, Narihito; Tadatomo, Kazuyuki

    2017-11-01

    In this study, a combined facet and flattening (FF) growth technique was implemented to fabricate GaN substrates by hydride vapor phase epitaxy. By changing the growth conditions, i.e., the growth temperature and V/III ratio, it was found that facet growth was promoted with a high V/III ratio and low temperature and planar growth was promoted with low V/III ratios and high temperature. We introduce a FF growth technique involving further reduction of the dislocation density using facet growth as the first step and flattening growth of the GaN layer as the second step. To further reduce dislocation density, we also finally demonstrate a multiple-step growth technique based on FF growth and succeeded in producing GaN substrates with overall dislocation densities on the order of 105 cm-2.

  2. Micro-Raman analysis of cubic GaN layers grown by MBE on (001) GaAs substrate

    Science.gov (United States)

    Tabata, A.; Lima, A. P.; Leite, J. R.; Lemos, V.; Schikora, D.; Schöttker, B.; Köhler, U.; As, D. J.; Lischka, K.

    1999-04-01

    Cubic GaN layers are grown by molecular beam epitaxy on (001) GaAs substrates. Optical micrographs of the GaN epilayers intentionally grown at Ga excess reveal the existence of surface irregularities such as bright rectangular structures, dark dots surrounded by rectangles and dark dots without rectangles. Micro-Raman spectroscopy is used to study the structural properties of these inclusions and of the epilayers in greater detail. We conclude that the observed irregularities are the result of a melting process due to the existence of a liquid Ga phase on the growing surface.

  3. Self-assembled Multilayers of Silica Nanospheres for Defect Reduction in Non- and Semipolar Gallium Nitride Epitaxial Layers.

    Science.gov (United States)

    Zhu, Tongtong; Ding, Tao; Tang, Fengzai; Han, Yisong; Ali, Muhammad; Badcock, Tom; Kappers, Menno J; Shields, Andrew J; Smoukov, Stoyan K; Oliver, Rachel A

    2016-02-03

    Non- and semipolar GaN have great potential to improve the efficiency of light emitting devices due to much reduced internal electric fields. However, heteroepitaxial GaN growth in these crystal orientations suffers from very high dislocation and stacking faults densities. Here, we report a facile method to obtain low defect density non- and semipolar heteroepitaxial GaN via selective area epitaxy using self-assembled multilayers of silica nanospheres (MSN). Nonpolar (11-20) and semipolar (11-22) GaN layers with high crystal quality have been achieved by epitaxial integration of the MSN and a simple one-step overgrowth process, by which both dislocation and basal plane stacking fault densities can be significantly reduced. The underlying defect reduction mechanisms include epitaxial growth through the MSN covered template, island nucleation via nanogaps in the MSN, and lateral overgrowth and coalescence above the MSN. InGaN/GaN multiple quantum wells structures grown on a nonpolar GaN/MSN template show more than 30-fold increase in the luminescence intensity compared to a control sample without the MSN. This self-assembled MSN technique provides a new platform for epitaxial growth of nitride semiconductors and offers unique opportunities for improving the material quality of GaN grown on other orientations and foreign substrates or heteroepitaxial growth of other lattice-mismatched materials.

  4. Mapping misorientation and crystallographic tilt in GaN layers via polychromatic microdiffraction

    Energy Technology Data Exchange (ETDEWEB)

    Barabash, R.I.; Ice, G.E.; Liu, W. [Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831 (United States); Roder, C.; Figge, S.; Einfeldt, S.; Hommel, D. [Institute of Solid State Physics, University of Bremen, P.O. Box 330 440, 28334 Bremen (Germany); Katona, T.M. [Electrical and Computer Engineering Department, College of Engineering, University of California at Santa Barbara, Santa Barbara, CA 93106 (United States); Speck, J.S.; DenBaars, S.P. [Materials Department, College of Engineering, University of California at Santa Barbara, Santa Barbara, CA 93106 (United States); Davis, R.F. [Materials Science and Engineering Department, North Carolina State University, Raleigh (United States)

    2006-06-15

    The spatial distribution of strain, dislocations, and crystallographic orientation in uncoalesced and coalesced GaN layers grown on striped Si or SiC substrates was studied by polychromatic X-ray microdiffraction and high resolution monochromatic X-ray diffraction. Tilt boundaries formed at the column/wing interface depending on the growth conditions and geometry of the striped substrate. The measurements revealed that the free-hanging wings are tilted upward at room temperature. A misorientation between the GaN(0001) and the Si(111) or SiC(0001) surface normal is observed. Distinct structural properties of the pendeo and cantilever epitaxially grown samples are discussed. (copyright 2006 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  5. Mn DOPING OF GaN LAYERS GROWN BY MOVPE

    Directory of Open Access Journals (Sweden)

    Petr Šimek

    2012-07-01

    Full Text Available In this contribution we present a growth of Ga1-xMnxN layers by MOVPE. Mn doped GaN layers were grown with and without undoped GaN templates on (0001 sapphire substrates in a quartz horizontal reactor. For the deposition of Ga1-xMnxN layers (MCp2Mn was used as a Mn – precursor. The flow of the Mn precursor was 0.2-3.2 μmol.min-1. The deposition of Ga1-xMnxN layers was carried out under the pressure of 200 mbar, the temperature 1050 °C and the V/III ratio of 1360. For the growth of high quality GaN:Mn layers it was necessary to grow these layers on a minimally partially coalesced layer of pure GaN. The direct deposition of GaN:Mn layer on the low temperature GaN buffer layer led to a three-dimensional growth during the whole deposition process. Another investigated parameter was the influence of nitrogen on the layer’s properties. A nearly constant ferromagnetic moment persisting up to room temperature was observed on the synthesized thin films.

  6. High growth rate GaN on 200 mm silicon by metal-organic vapor phase epitaxy for high electron mobility transistors

    Science.gov (United States)

    Charles, M.; Baines, Y.; Bavard, A.; Bouveyron, R.

    2018-02-01

    It is increasingly important to reduce the cycle time of epitaxial growth, in order to reduce the costs of device fabrication, especially for GaN based structures which typically have growth cycles of several hours. We have performed a comprehensive study using metal-organic vapor phase epitaxy (MOVPE) investigating the effects of changing GaN growth rates from 0.9 to 14.5 μm/h. Although there is no significant effect on the strain incorporated in the layers, we have seen changes in the surface morphology which can be related to the change in dislocation behaviour and surface diffusion effects. At the small scale, as seen by AFM, increased dislocation density for higher growth rates leads to increased pinning of growth terraces, resulting in more closely spaced terraces. At a larger scale of hundreds of μm observed by optical profiling, we have related the formation of grains to the rate of surface diffusion of adatoms using a random walk model, implying diffusion distances from 30 μm for the highest growth rates up to 100 μm for the lowest. The increased growth rate also increases the intrinsic carbon incorporation which can increase the breakdown voltage of GaN films. Despite an increased threading dislocation density, these very high growth rates of 14.5 μm/hr by MOVPE have been shown to be appealing for reducing epitaxial growth cycle times and therefore costs in High Electron Mobility Transistor (HEMT) structures.

  7. Stress distribution of GaN layer grown on micro-pillar patterned GaN templates

    OpenAIRE

    Nagarajan, S; Svensk, O.; Ali, M.; G. Naresh-Kumar; Trager-Cowan, C.; Suihkonen, S.; Sopanen, Markku; Lipsanen, Harri

    2013-01-01

    High-resolution Raman mapping of the stress distribution in an etched GaN micro-pillar template and a 5 μm thick GaN layer grown on a micro-pillar patterned GaN template is investigated. Raman mapping of the E2 (high) phonon shows differences in stress between the coalescing boundary, the top surface of the pillar region and around the GaN micro-pillar. Increased compressive stress is observed at the coalescing boundary of two adjacent GaN micro-pillars, when compared to the laterally grown G...

  8. Stress in (Al, Ga)N heterostructures grown on 6H-SiC and Si substrates byplasma-assisted molecular beam epitaxy

    Science.gov (United States)

    Koshelev, O. A.; Nechaev, D. V.; Sitnikova, A. A.; Ratnikov, V. V.; Ivanov, S. V.; Jmerik, V. N.

    2017-11-01

    The paper describes experimental results on low temperature plasma-assisted molecular beam epitaxy of GaN/AlN heterostructures on both 6H-SiC and Si(111) substrates. We demonstrate that application of migration enhanced epitaxy and metal-modulated epitaxy for growth of AlN nucleation and buffer layers lowers the screw and edge(total)threading dislocation (TD) densities down to 1.7·108 and 2·109 cm-2, respectively, in a 2.8-μm-thick GaN buffer layer grown atop of AlN/6H-SiC. The screw and total TD densities of 1.2·109 and 7.4·109 cm-2, respectively, were achieved in a 1-μm-thickGaN/AlNheterostructure on Si(111). Stress generation and relaxation in GaN/AlN heterostructures were investigated by using multi-beam optical stress sensor (MOSS) to achieve zero substrate curvature at room temperature. It is demonstrated that a 1-μm-thick GaN/AlN buffer layer grown by PA MBE provides planar substrate morphology in the case of growth on Si substrates whereas 5-μm-thick GaN buffer layers have to be used to achieve the same when growing on 6H-SiC substrates.

  9. Evolution of threading dislocations in GaN epitaxial laterally overgrown on GaN templates using self-organized graphene as a nano-mask

    Science.gov (United States)

    Xu, Yu; Cao, Bing; He, Shunyu; Qi, Lin; Li, Zongyao; Cai, Demin; Zhang, Yumin; Ren, Guoqiang; Wang, Jianfeng; Wang, Chinhua; Xu, Ke

    2017-09-01

    Growth of high-quality GaN within a limited thickness is still a challenge, which is important both in improving device performance and in reducing the cost. In this work, a self-organized graphene is investigated as a nano-mask for two-step GaN epitaxial lateral overgrowth (2S-ELOG) in hydride vapor phase epitaxy. Efficient improvement of crystal quality was revealed by x-ray diffraction. The microstructural properties, especially the evolution of threading dislocations (TDs), were investigated by scanning electron microscopy and transmission electron microscopy. Stacking faults blocked the propagation of TDs, and fewer new TDs were subsequently generated by the coalescence of different orientational domains and lateral-overgrown GaN. This evolution mechanism of TDs was different from that of traditional ELOG technology or one-step ELOG (1S-ELOG) technology using a two-dimensional (2D) material as a mask.

  10. High-Quality GaN Epilayers Achieved by Facet-Controlled Epitaxial Lateral Overgrowth on Sputtered AlN/PSS Templates.

    Science.gov (United States)

    He, Chenguang; Zhao, Wei; Zhang, Kang; He, Longfei; Wu, Hualong; Liu, Ningyang; Zhang, Shan; Liu, Xiaoyan; Chen, Zhitao

    2017-12-13

    It is widely believed that the lack of high-quality GaN wafers severely hinders the progress in GaN-based devices, especially for defect-sensitive devices. Here, low-cost AlN buffer layers were sputtered on cone-shaped patterned sapphire substrates (PSSs) to obtain high-quality GaN epilayers. Without any mask or regrowth, facet-controlled epitaxial lateral overgrowth was realized by metal-organic chemical vapor deposition. The uniform coating of the sputtered AlN buffer layer and the optimized multiple modulation guaranteed high growth selectivity and uniformity of the GaN epilayer. As a result, an extremely smooth surface was achieved with an average roughness of 0.17 nm over 3 × 3 μm2. It was found that the sputtered AlN buffer layer could significantly suppress dislocations on the cones. Moreover, the optimized three-dimensional growth process could effectively promote dislocation bending. Therefore, the threading dislocation density (TDD) of the GaN epilayer was reduced to 4.6 × 107 cm-2, which is about an order of magnitude lower than the case of two-step GaN on the PSS. In addition, contamination and crack in the light-emitting diode fabricated on the obtained GaN were also effectively suppressed by using the sputtered AlN buffer layer. All of these advantages led to a high output power of 116 mW at 500 mA with an emission wavelength of 375 nm. This simple, yet effective growth technique is believed to have great application prospects in high-performance TDD-sensitive optoelectronic and electronic devices.

  11. TEM studies of laterally overgrown GaN layers grown on non-polarsubstrates

    Energy Technology Data Exchange (ETDEWEB)

    Liliental-Weber, Z.; Ni, X.; Morkoc, H.

    2006-01-05

    Transmission electron microscopy (TEM) was used to study pendeo-epitaxial GaN layers grown on polar and non-polar 4H SiC substrates. The structural quality of the overgrown layers was evaluated using a number of TEM methods. Growth of pendeo-epitaxial layers on polar substrates leads to better structural quality of the overgrown areas, however edge-on dislocations are found at the meeting fronts of two wings. Some misorientation between the 'seed' area and wing area was detected by Convergent Beam Electron Diffraction. Growth of pendeo-epitaxial layers on non-polar substrates is more difficult. Two wings on the opposite site of the seed area grow in two different polar directions with different growth rates. Most dislocations in a wing grown with Ga polarity are 10 times wider than wings grown with N-polarity making coalescence of these layers difficult. Most dislocations in a wing grown with Ga polarity bend in a direction parallel to the substrate, but some of them also propagate to the sample surface. Stacking faults formed on the c-plane and prismatic plane occasionally were found. Some misorientation between the wings and seed was detected using Large Angle Convergent Beam Diffraction.

  12. Photoenhanced atomic layer epitaxy. Hikari reiki genshiso epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Mashita, M.; Kawakyu, Y. (Toshiba corp., Tokyo (Japan))

    1991-10-01

    The growth temperature range was greatly expanded of atomic layer epitaxy (ALE) expected as the growth process of ultra-thin stacks. Ga layers and As layers were formed one after the other on a GaAs substrate in the atmosphere of trimethylgallium (TMG) or AsH{sub 2} supplied alternately, by KrF excimer laser irradiation normal to the substrate. As a result, the growth temperature range was 460-540{degree}C nearly 10 times that of 500 {plus minus} several degrees centigrade in conventional thermal growth method. Based on the experimental result where light absorption of source molecules adsorbed on a substrate surface was larger than that under gaseous phase condition, new adsorbed layer enhancement model was proposed to explain above irradiation effect verifying it by experiments. As this photoenhancement technique is applied to other materials, possible fabrication of new crystal structures as a super lattice with ultra-thin stacks of single atomic layers is expected because of a larger freedom in material combination for hetero-ALE. 11 refs., 7 figs.

  13. Eu-Doped GaN Films Grown by Phase Shift Epitaxy

    Science.gov (United States)

    Zhong, Mingyu; Steckl, Andrew J.

    2010-12-01

    Phase shift epitaxy (PSE) is a dynamic thin film growth technique wherein constituent fluxes are pulsed with an adjustable phase shift. PSE enables the introduction of dopants during the optimum segment of the growth cycle. Eu-doped GaN films were grown with Ga and Eu shutters periodically opened and closed (with varying phase shift) while keeping N flux constant, so that the Ga and Eu coverage on surface during each cycle varies in a controlled way. The Eu concentration and photoluminescence (PL) efficiency are strongly influenced by the PSE parameters. Eu ions doped during high Ga coverage exhibit strong PL efficiency.

  14. Anisotropic structural and optical properties of semi-polar (11-22) GaN grown on m-plane sapphire using double AlN buffer layers

    Science.gov (United States)

    Zhao, Guijuan; Wang, Lianshan; Yang, Shaoyan; Li, Huijie; Wei, Hongyuan; Han, Dongyue; Wang, Zhanguo

    2016-02-01

    We report the anisotropic structural and optical properties of semi-polar (11-22) GaN grown on m-plane sapphire using a three-step growth method which consisted of a low temperature AlN buffer layer, followed by a high temperature AlN buffer layer and GaN growth. By introducing double AlN buffer layers, we substantially improve the crystal and optical qualities of semi-polar (11-22) GaN, and significantly reduce the density of stacking faults and dislocations. The high resolution x-ray diffraction measurement revealed that the in-plane anisotropic structural characteristics of GaN layer are azimuthal dependent. Transmission electron microscopy analysis showed that the majority of dislocations in the GaN epitaxial layer grown on m-sapphire are the mixed-type and the orientation of GaN layer was rotated 58.4° against the substrate. The room temperature photoluminescence (PL) spectra showed the PL intensity and wavelength have polarization dependence along parallel and perpendicular to the [1-100] axis (polarization degrees ~ 0.63). The realization of a high polarization semi-polar GaN would be useful to achieve III-nitride based lighting emission device for displays and backlighting.

  15. Anisotropic structural and optical properties of semi-polar (11–22) GaN grown on m-plane sapphire using double AlN buffer layers

    Science.gov (United States)

    Zhao, Guijuan; Wang, Lianshan; Yang, Shaoyan; Li, Huijie; Wei, Hongyuan; Han, Dongyue; Wang, Zhanguo

    2016-01-01

    We report the anisotropic structural and optical properties of semi-polar (11–22) GaN grown on m-plane sapphire using a three-step growth method which consisted of a low temperature AlN buffer layer, followed by a high temperature AlN buffer layer and GaN growth. By introducing double AlN buffer layers, we substantially improve the crystal and optical qualities of semi-polar (11–22) GaN, and significantly reduce the density of stacking faults and dislocations. The high resolution x-ray diffraction measurement revealed that the in-plane anisotropic structural characteristics of GaN layer are azimuthal dependent. Transmission electron microscopy analysis showed that the majority of dislocations in the GaN epitaxial layer grown on m-sapphire are the mixed-type and the orientation of GaN layer was rotated 58.4° against the substrate. The room temperature photoluminescence (PL) spectra showed the PL intensity and wavelength have polarization dependence along parallel and perpendicular to the [1–100] axis (polarization degrees ~ 0.63). The realization of a high polarization semi-polar GaN would be useful to achieve III-nitride based lighting emission device for displays and backlighting. PMID:26861595

  16. Cross-sectional imaging of pendeo-epitaxial GaN using continuous-wave two-photon microphotoluminescence

    Science.gov (United States)

    Schuck, P. J.; Grober, R. D.; Roskowski, A. M.; Einfeldt, S.; Davis, R. F.

    2002-09-01

    A technique utilizing continuous-wave two-photon absorption has been developed for optically sectioning and imaging deep into GaN structures. Imaging at depths greater than 20 mum below the surface of a coalesced pendeo-epitaxial GaN sample is demonstrated. Free and donor-bound excitonic emission in this sample appears to originate at the surface, acceptor-bound exciton transitions are strongest in the top bulk portion of the sample, and subgap luminescence is most intense deep in the sample. The depth resolution of the imaging system is measured to be 1.75 mum near the GaN surface.

  17. Growth of low-threading-dislocation-density GaN on graphene by hydride vapor phase epitaxy

    Science.gov (United States)

    He, Shunyu; Xu, Yu; Qi, Lin; Li, Zongyao; Cao, Bing; Wang, Chinhua; Zhang, Jicai; Wang, Jianfeng; Xu, Ke

    2017-03-01

    Recently, gallium nitride (GaN) films grown on graphene have been widely studied. Here, we have grown low-threading-dislocation-density GaN films on graphene by hydride vapor phase epitaxy (HVPE). The full widths at half maximum (FWHMs) of X-ray rocking curves (XRCs) of the GaN films were 276 and 350 arcsec at the 0002 and 10\\bar{1}2 reflections, respectively. This shows that the threading dislocation densities are on the order of magnitude of 108 cm-2, which is consistent with the results of cathodoluminescence (CL).

  18. Transmission Electron Microscope Observation of Cubic GaN Grown by Metalorganic Vapor Phase Epitaxy with Dimethylhydrazine on (001) GaAs

    Science.gov (United States)

    Kuwano, Noriyuki; Nagatomo, Yoshiyuki; Kobayashi, Kenki; Oki, Kensuke; Miyoshi, Seiro; Yaguchi, Hiroyuki; Onabe, Kentaro; Shiraki, Yasuhiro

    1994-01-01

    Cross-sectional transmission electron microscope observation has been performed on the microstructure of GaN films grown on a (001) GaAs substrate by metalorgahic vapor phase epitaxy (MOVPE) using 1,1-dimethylhydrazine (DMHy) and trimethylgallium (TMG) as the sources of nitrogen and gallium, respectively. Before the deposition, the surface of the substrate was nitrided with DMHy. High-resolution images and electron diffraction patterns confirmed that the GaN films have a zincblende structure (β-GaN) with the lattice constant of a GaN=0.454 nm, and contain bands of stacking faults parallel to {111} planes. The interface between GaN and GaAs is made of {111} facets with no interlayer. Misfit dislocations are found to be inserted on the interface approximately every five atomic planes of GaAs. The nitridation treatment with only DMHy for 130 min is found to form a thick layer of β-GaN on the (001) GaAs substrate. Nuclei of β-GaN formed by the pretreatment of surface nitridation play an important role in growing GaN in a zincblende structure during the supply of DMHy and TMG. The formation of facets on the top surface of GaN and on the interface of GaN/GaAs is explained in terms of the diffusion of arsenic in β-GaN. The characteristics of the structure of GaN films grown at 600 and 650° C are also presented.

  19. Growth of GaN on ZrB 2 substrate by metal-organic vapor phase epitaxy

    Science.gov (United States)

    Tomida, Yoshihito; Nitta, Shugo; Kamiyama, Satoshi; Amano, Hiroshi; Akasaki, Isamu; Otani, Shigeki; Kinoshita, Hiroyuki; Liu, Rong; Bell, Abigail; Ponce, Fernando A.

    2003-06-01

    Growth of GaN by metal-organic vapor phase epitaxy (MOVPE) on metallic zirconium diboride (ZrB 2) substrate was investigated. Cross-sectional transmission electron microscopy (TEM) showed that cubic ZrB xN 1- x is formed on the surface when ZrB 2 is exposed to ammonia-containing atmosphere, which protects the nucleation of GaN or AlN. We solved the problem by covering ZrB 2 surface with very thin AlN or GaN at low temperature, thereby achieving high-quality GaN growth with a dislocation density less than 10 8 cm -2. Direct conduction was achieved through the back of ZrB 2 and the surface of Si-doped GaN.

  20. p-type GaN grown by phase shift epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Zhong, M.; Steckl, A. J., E-mail: a.steckl@uc.edu [Department of Electrical Engineering and Computing Systems, University of Cincinnati, Cincinnati, Ohio 45221-0030 (United States); Roberts, J. [Nitronex Corporation, Raleigh, North Carolina 27606 (United States); Kong, W.; Brown, A. S. [Department of Electrical and Computer Engineering, Duke University, Durham, North Carolina 27708 (United States)

    2014-01-06

    Phase shift epitaxy (PSE) is a periodic growth scheme, which desynchronizes host material growth process from dopant incorporation, allowing independent optimization. p-type doping of GaN with Mg by PSE is accomplished with molecular beam epitaxy by periodic shutter action (in order to iterate between Ga- and N-rich surface conditions) and by adjusting time delays between dopant and Ga shutters. Optimum PSE growth was obtained by turning on the Mg flux in the N-rich condition. This suppresses Mg self-compensation at high Mg concentration and produces fairly high hole concentrations (2.4 × 10{sup 18} cm{sup −3})

  1. Dislocation propagation in GaN films formed by epitaxial lateral overgrowth

    Science.gov (United States)

    Sakai; Sunakawa; Kimura; Usui

    2000-01-01

    We have investigated by scanning electron microscopy (SEM) and transmission electron microscopy (TEM) the relationship between surface morphological evolution and dislocation propagation in GaN films formed by epitaxial lateral overgrowth (ELO) in hydride vapour phase epitaxy. The SEM observations revealed that step and terrace structures were formed on (0001) surfaces of the films both in the earlier and the later stages of growth, suggesting the occurrence of step-flow growth during ELO. Bending dislocations with laterally propagated segments were frequently observed in the ELO films and their morphology led to a reduction in threading dislocation density in the film surface regions. Systematic TEM observations were performed to reveal the detailed structure of the bending dislocations. Comparison between the SEM and the TEM results showed that the lateral propagation of the dislocation was closely related to the appearance of the [1101) facets. A mechanism for dislocation propagation is discussed that explains the observed dislocation structure and surface step morphology.

  2. Characterization of crystallographic properties and defects via X-ray microdiffraction in GaN(0001) layers

    Energy Technology Data Exchange (ETDEWEB)

    Barabash, R.I.; Barabash, O.M.; Ice, G.E. [Metals and Ceramics Div., Oak Ridge National Laboratory, Oak Ridge, TN 37831 (United States); Roder, C.; Figge, S.; Einfeldt, S.; Hommel, D. [Institute of Solid State Physics, University of Bremen, P.O. Box 330 440, 28334 Bremen (Germany); Katona, T.M. [Electrical and Computer Engineering Department, College of Engineering, University of California at Santa Barbara, Santa Barbara 93106 (United States); Speck, J.S.; DenBaars, S.P. [Materials Department, College of Engineering, University of California at Santa Barbara, Santa Barbara 93106 (United States); Davis, R.F. [Materials Science and Engineering Department, North Carolina State University, Raleigh (United States)

    2006-01-01

    Intrinsic stresses due to lattice mismatch, high densities of threading dislocations, and extrinsic stresses resulting from the mismatch in the coefficients of thermal expansion, are present in almost all III-Nitride heterostructures. Stress relaxation in the GaN layers occurs in conventional, cantilever (CE) and in pendeo-epitaxial (PE) films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. Polychromatic X-ray microdiffraction, high resolution monochromatic X-ray diffraction and SEM analysis have been used to determine the crystallographic properties, misfit dislocations distribution and crystallographic tilts in uncoalesced GaN layers grown by PE and CE. The crystallographic tilt between the GaN(0001) and Si(111) planes was detected in the CE grown samples on Si(111). In contrast there was no tilt between GaN(0001) and SiC(0001) planes in PE grown samples. The wings are tilted upward for both the PE and CE grown uncoalesced GaN layers. (copyright 2006 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  3. Characterization of crystallographic properties and defects via X-ray microdiffraction in GaN (0001) layers

    Science.gov (United States)

    Barabash, R. I.; Barabash, O. M.; Ice, G. E.; Roder, C.; Figge, S.; Einfeldt, S.; Hommel, D.; Katona, T. M.; Speck, J. S.; Denbaars, S. P.; Davis, R. F.

    2006-01-01

    Intrinsic stresses due to lattice mismatch, high densities of threading dislocations, and extrinsic stresses resulting from the mismatch in the coefficients of thermal expansion, are present in almost all III-Nitride heterostructures. Stress relaxation in the GaN layers occurs in conventional, cantilever (CE) and in pendeo-epitaxial (PE) films via the formation of additional misfit dislocations, domain boundaries, elastic strain and wing tilt. Polychromatic X-ray microdiffraction, high resolution monochromatic X-ray diffraction and SEM analysis have been used to determine the crystallographic properties, misfit dislocations distribution and crystallographic tilts in uncoalesced GaN layers grown by PE and CE. The crystallographic tilt between the GaN(0001) and Si(111) planes was detected in the CE grown samples on Si(111). In contrast there was no tilt between GaN(0001) and SiC(0001) planes in PE grown samples. The wings are tilted upward for both the PE and CE grown uncoalesced GaN layers.

  4. Heat resistive dielectric multi-layer micro-mirror array in epitaxial lateral overgrowth gallium nitride.

    Science.gov (United States)

    Huang, Chen-Yang; Ku, Hao-Min; Liao, Wei-Tsai; Chao, Chu-Li; Tsay, Jenq-Dar; Chao, Shiuh

    2009-03-30

    Ta2O5 / SiO2 dielectric multi-layer micro-mirror array (MMA) with 3mm mirror size and 6mm array period was fabricated on c-plane sapphire substrate. The MMA was subjected to 1200 degrees C high temperature annealing and remained intact with high reflectance in contrast to the continuous multi-layer for which the layers have undergone severe damage by 1200 degrees C annealing. Epitaxial lateral overgrowth (ELO) of gallium nitride (GaN) was applied to the MMA that was deposited on both sapphire and sapphire with 2:56 mm GaN template. The MMA was fully embedded in the ELO GaN and remained intact. The result implies that our MMA is compatible to the high temperature growth environment of GaN and the MMA could be incorporated into the structure of the micro-LED array as a one to one micro backlight reflector, or as the patterned structure on the large area LED for controlling the output light.

  5. Phase separation suppression in InGaN epitaxial layers due to biaxial strain

    Science.gov (United States)

    Tabata, A.; Teles, L. K.; Scolfaro, L. M. R.; Leite, J. R.; Kharchenko, A.; Frey, T.; As, D. J.; Schikora, D.; Lischka, K.; Furthmüller, J.; Bechstedt, F.

    2002-02-01

    Phase separation suppression due to external biaxial strain is observed in InxGa1-xN alloy layers by Raman scattering spectroscopy. The effect is taking place in thin epitaxial layers pseudomorphically grown by molecular-beam epitaxy on unstrained GaN(001) buffers. Ab initio calculations carried out for the alloy free energy predict and Raman measurements confirm that biaxial strain suppress the formation of phase-separated In-rich quantum dots in the InxGa1-xN layers. Since quantum dots are effective radiative recombination centers in InGaN, we conclude that strain quenches an important channel of light emission in optoelectronic devices based on pseudobinary group-III nitride semiconductors.

  6. Hydride vapor phase epitaxy growth of GaN, InGaN, ScN, and ScAIN

    NARCIS (Netherlands)

    Bohnen, T.

    2010-01-01

    Chemical vapor deposition (CVD); hydride vapor phase epitaxy (HVPE); gallium nitride (GaN); indium gallium nitride (InGaN); scandium nitride (ScN); scandium aluminum nitride (ScAlN); semiconductors; thin films; nanowires; III nitrides; crystal growth - We studied the HVPE growth of different III

  7. High quality factor whispering gallery modes from self-assembled hexagonal GaN rods grown by metal-organic vapor phase epitaxy.

    Science.gov (United States)

    Tessarek, C; Sarau, G; Kiometzis, M; Christiansen, S

    2013-02-11

    Self-assembled GaN rods were grown on sapphire by metal-organic vapor phase epitaxy using a simple two-step method that relies first on a nitridation step followed by GaN epitaxy. The mask-free rods formed without any additional catalyst. Most of the vertically aligned rods exhibit a regular hexagonal shape with sharp edges and smooth sidewall facets. Cathodo- and microphotoluminescence investigations were carried out on single GaN rods. Whispering gallery modes with quality factors greater than 4000 were measured demonstrating the high morphological and optical quality of the self-assembled GaN rods.

  8. Highly c-axis-oriented one-inch square freestanding GaN grown by hydride vapor-phase epitaxy using an AIN deposited on Si

    CERN Document Server

    Lee, M H; Chung, S H; Moon, D C

    1999-01-01

    In this letter, we report on the growth and the properties of freestanding GaN substrates. Large areas of one-inch square with a thickness of a 0.5 mm were grown by the hydride vapor-phase epitaxy (HVPE) method after a thick film of GaN was grown on an AIN buffer layer deposited on a sacrificial Si substrate which was subsequently chemically removed. The GaN substrate showed intensified X-ray diffraction from the (00.2) and the (00.4) planes, and the full width at half maximum of the double-crystal X-ray diffraction curve was as large as 4.2 degrees. The photoluminescence spectra measured at 10 K and at 300 K exhibited a sharp and strong excitonic emission without deep-level emission. They also showed n-type conduction with an electron concentration of approx 1x10 sup 1 sup 8 cm sup - sup 3 and a Hall mobility of 50 cm sup 2 / Vsec. The highly c-axis oriented large-area freestanding GaN prepared using a Si sacrificial substrate by HVPE through this work can be used for homoepitaxial growth of GaN-based optoel...

  9. GaN layer growth by HVPE on m-plane sapphire substrates

    Energy Technology Data Exchange (ETDEWEB)

    Usikov, Alexander; Shapovalov, Lisa; Ivantsov, Vladimir; Kovalenkov, Oleg; Syrkin, Alexander [Technologies and Devices International an Oxford Instruments Company, 12214 Plum Orchard Dr., Silver Spring, MD 20904 (United States); Spiberg, Philippe; Brown, Robert [Ostendo Technologies, Inc., 6185 Paseo del Norte, Suite 200, Carlsbad, CA 92011 (United States)

    2009-06-15

    Semipolar GaN layers were grown on m-plane sapphire substrates by HVPE. Insertion of Al{sub x}Ga{sub 1-x}N (x{proportional_to}0.1-0.6) layer in-between m-plane sapphire substrate and GaN layer promoted to improve crystalline quality and to grow of semipolar (11-22) plane GaN layers. X-ray diffraction (11-22){omega}-scan rocking curve FWHM of 298 arcsec was measured for a 30 {mu}m thick (11-22)GaN layer. Depending on growth conditions, m-plane GaN layer having micro-crystallites of other orientations (mainly of (11-24) plane GaN layer) was also grown. (copyright 2009 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  10. Enhanced UV detection by non-polar epitaxial GaN films

    Directory of Open Access Journals (Sweden)

    Shruti Mukundan

    2015-12-01

    Full Text Available Nonpolar a-GaN (11-20 epilayers were grown on r-plane (1-102 sapphire substrates using plasma assisted molecular beam epitaxy. High resolution x-ray diffractometer confirmed the orientation of the grown film. Effect of the Ga/N ratio on the morphology and strain of a-GaN epilayers was compared and the best condition was obtained for the nitrogen flow of 1 sccm. Atomic force microscopy was used to analyze the surface morphology while the strain in the film was quantitatively measured using Raman spectroscopy and qualitatively analyzed by reciprocal space mapping technique. UV photo response of a-GaN film was measured after fabricating a metal-semiconductor-metal structure over the film with gold metal. The external quantum efficiency of the photodetectors fabricated in the (0002 polar and (11-20 nonpolar growth directions were compared in terms of responsivity and nonpolar GaN showed the best sensitivity at the cost of comparatively slow response time.

  11. Growth of N-polar GaN by ammonia molecular beam epitaxy

    Science.gov (United States)

    Fireman, M. N.; Li, Haoran; Keller, Stacia; Mishra, Umesh K.; Speck, James S.

    2018-01-01

    The homoepitaxial growth of N-polar GaN was investigated by ammonia molecular beam epitaxy. Systematic growth studies varying the V/III flux ratio and the growth temperature indicated that the strongest factor in realizing morphologically smooth films was the growth temperature; N-face films needed to be grown approximately 100 °C or greater than Ga-face films provided the same metal flux. Smooth N-face films could also be grown at temperatures only 50 °C greater than Ga-face films, albeit under reduced metal flux. Too high a growth temperature and too low a metal flux resulted in dislocation mediated pitting of the surface. The unintentional impurity incorporation of such films was also studied by secondary mass ion spectroscopy and most importantly revealed an oxygen content in the mid 1017 to the mid 1018 cm-3 range. Hall measurements confirmed that this oxygen impurity resulted in n-type films, with carrier concentrations and mobilities comparable to those of intentionally silicon doped GaN.

  12. Patterned growth of InGaN/GaN quantum wells on freestanding GaN grating by molecular beam epitaxy

    Directory of Open Access Journals (Sweden)

    Wang Yongjin

    2011-01-01

    Full Text Available Abstract We report here the epitaxial growth of InGaN/GaN quantum wells on freestanding GaN gratings by molecular beam epitaxy (MBE. Various GaN gratings are defined by electron beam lithography and realized on GaN-on-silicon substrate by fast atom beam etching. Silicon substrate beneath GaN grating region is removed from the backside to form freestanding GaN gratings, and the patterned growth is subsequently performed on the prepared GaN template by MBE. The selective growth takes place with the assistance of nanoscale GaN gratings and depends on the grating period P and the grating width W. Importantly, coalescences between two side facets are realized to generate epitaxial gratings with triangular section. Thin epitaxial gratings produce the promising photoluminescence performance. This work provides a feasible way for further GaN-based integrated optics devices by a combination of GaN micromachining and epitaxial growth on a GaN-on-silicon substrate. PACS 81.05.Ea; 81.65.Cf; 81.15.Hi.

  13. Single-Crystal N-polar GaN p-n Diodes by Plasma-Assisted Molecular Beam Epitaxy

    OpenAIRE

    Cho, Yongjin; Hu, Zongyang; Nomoto, Kazuki; Xing, Huili Grace; Jena, Debdeep

    2017-01-01

    N-polar GaN p-n diodes are realized on single-crystal N-polar GaN bulk wafers by plasma-assisted molecular beam epitaxy growth. The current-voltage characteristics show high-quality rectification and electroluminescence characteristics with a high on/off current ratio and interband photon emission. The measured electroluminescence spectrum is dominated by strong near-band edge emission, while deep level luminescence is greatly suppressed. A very low dislocation density leads to a high reverse...

  14. Optical characterization of epitaxial semiconductor layers

    CERN Document Server

    Richter, Wolfgang

    1996-01-01

    The last decade has witnessed an explosive development in the growth of expitaxial layers and structures with atomic-scale dimensions. This progress has created new demands for the characterization of those stuctures. Various methods have been refined and new ones developed with the main emphasis on non-destructive in-situ characterization. Among those, methods which rely on the interaction of electromagnetic radiation with matter are particularly valuable. In this book standard methods such as far-infrared spectroscopy, ellipsometry, Raman scattering, and high-resolution X-ray diffraction are presented, as well as new advanced techniques which provide the potential for better in-situ characterization of epitaxial structures (such as reflection anistropy spectroscopy, infrared reflection-absorption spectroscopy, second-harmonic generation, and others). This volume is intended for researchers working at universities or in industry, as well as for graduate students who are interested in the characterization of ...

  15. Influence of the nucleation layer annealing atmosphere on the resistivity of GaN grown by metalorganic chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Luo, Weike, E-mail: luowk688@163.com; Li, Liang; Li, Zhonghui; Dong, Xun; Peng, Daqing; Zhang, Dongguo; Xu, Xiaojun

    2015-06-05

    Graphical abstract: LT-PL spectra of GaN samples A, B and C with sheet resistance of 1.1 × 10{sup 4} Ω/sq, 5.5 × 10{sup 4} Ω/sq and 1.0 × 10{sup 8} Ω/sq, respectively. - Highlights: • HR-GaN was fabricated by optimizing the nucleation layer annealing (NL) atmosphere. • The morphology of NLs annealed in different atmosphere has been investigated. • The resistance of GaN increased with density of edge type threading dislocations. • The PL results indicate that the HR-GaN is achieved due to the compensation of acceptor states. - Abstract: High-resistance (HR) GaN with sheet resistance of 1.0 × 10{sup 8} Ω/sq was grown on sapphire substrates using metal organic chemical vapor deposition. Sheet resistance of the GaN film increases 4 orders of magnitude by changing the nucleation layer (NL) annealing atmosphere from H{sub 2} to N{sub 2}. It is observed that the morphology of the NLs strongly depends on the annealing atmosphere. The analysis results based on high-resolution X-ray diffraction (HR-XRD) and etch pit density (EPD) measurements demonstrate that the density of edge-type threading dislocations increases with the proportion of the N{sub 2} in the annealing atmosphere. Photoluminescence (PL) spectra is employed to analyze the optical properties of GaN films. The XRD and PL results indicate the primary compensating mechanism is due to acceptor levels introduced by the increase in edge-type threading dislocations density. It is concluded that the annealing atmosphere of the NL controls sizes and densities of the nucleation islands, which affect electrical properties of GaN epitaxial films through changing the ratio of edge to screw/mixed-type threading dislocations.

  16. Microstructures of aluminum gallium nitride epitaxial layers

    Science.gov (United States)

    Wise, Adam

    Stress relief mechanisms and microstructures of AlxGa 1-xN thin films were investigated by growing samples by MBE and MOCVD. For investigation of stress relief mechanisms, a series of eight GaN samples were grown using MOCVD with AlxGa1-xN interlayers ranging from xAl=0.14 to xAl=1. Each successive interlayer in a given sample was increased in thickness and followed by a GaN probe-layer. A multi-beam optical stress sensor (MOSS) was used to monitor the stress in the sample during the growth process and determine the onset of stress relaxation. The thicknesses determined for stress relief onset in the interlayers were compared with calculations of Griffith's Criterion for hexagonal thin films and found to closely follow the predicted thicknesses of surface crack formation. For investigation of microstructures in AlxGa1-xN thin films, several sets of samples were grown by MOCVD, with varying pressure, temperature, and composition, and by MBE with varying temperature. The samples were examined by transmission electron microscopy, including [101¯0] selected area electron diffraction (SAED) patterns and weak beam dark field images taken with g=(0002) and g=(1¯21¯0). The MOCVD samples with composition variation were examined with [112¯0] SAED patterns, and the MBE-grown samples were examined using z-contrast imaging. All the MOCVD samples showed signs of ordering, while none of the MBE-grown samples did. In addition, the ordering was shown to be forming as thin plates of ordered material on the (0001) planes, anisotropic within the plane. Some MBE-grown samples were shown to have strong composition modulations arranged in bands arranged parallel to the surface of the sample, due to a balance between strain energy in the samples and the interfacial energy occurring between regions of high and low xAl. The samples grown by MOCVD were shown to have signs of phase separation in addition to the ordering observed. These samples show enhanced ordering in the system when

  17. Interface relaxation and band gap shift in epitaxial layers

    Directory of Open Access Journals (Sweden)

    Ziming Zhu

    2012-12-01

    Full Text Available Although it is well known that the interface relaxation plays the crucial role for the electronic properties in semiconductor epitaxial layers, there is lack of a clear definition of relationship between interfacial bond-energy variation and interface bond-nature-factor (IBNF in epitaxial layers before and after relaxation. Here we establish an analytical method to shed light on the relationship between the IBNF and the bond-energy change, as well as the relation with band offset in epitaxial layers from the perspective of atomic-bond-relaxation consideration and continuum mechanics. The theoretical predictions are consistent with the available evidences, which provide an atomistic understanding on underlying mechanism of interface effect in epitaxial nanostructures. Thus, it will be helpful for opening up to tailor physical-chemical properties of the epitaxial nanostructures to the desired specifications.

  18. Single-crystal N-polar GaN p-n diodes by plasma-assisted molecular beam epitaxy

    Science.gov (United States)

    Cho, YongJin; Hu, Zongyang; Nomoto, Kazuki; Xing, Huili Grace; Jena, Debdeep

    2017-06-01

    N-polar GaN p-n diodes are realized on single-crystal N-polar GaN bulk wafers by plasma-assisted molecular beam epitaxy growth. The current-voltage characteristics show high-quality rectification and electroluminescence characteristics with a high on currents ˜10 kA/cm2, low off currents 109, and interband photon emission. The measured electroluminescence spectrum is dominated by a strong near-band edge emission, while deep level luminescence is greatly suppressed. A very low dislocation density leads to a high reverse breakdown electric field of ˜2.2 MV/cm without fields plates—the highest reported for N-polar epitaxial structures. The low leakage current N-polar diodes open up several potential applications in polarization-engineered photonic and electronic devices.

  19. Characteristics of stimulated emission from optically pumped freestanding GaN grown by hydride vapor-phase epitaxy

    CERN Document Server

    Lee, M H; Kim, S T; Chung, S H; Moon, D C

    1999-01-01

    In this study, we observed optically pumped stimulated emission at room temperature in quasi-bulk GaN prepared from thick-film GaN grown on a sapphire substrate by using hydride vapor-phase epitaxy and subsequent mechanical removal of the sapphire substrate. The stimulated emission from the surface and 1-mm-wide-cleaved cavity of the GaN was red-shifted compared to the spontaneous emission by increasing the optical pumping-power density, and the full width at half maximum (FWHM) of the peak decreased. The stimulated emission was demonstrated to have a highly TE-mode polarized nature, and the super-linear dependence of the integrated emission intensity on the excitation power indicated a threshold pump-power density of I sub t sub h = 2 MW/cm sup 2 for one set of stimulated emissions.

  20. Screw dislocation-driven epitaxial solution growth of ZnO nanowires seeded by dislocations in GaN substrates.

    Science.gov (United States)

    Morin, Stephen A; Jin, Song

    2010-09-08

    In the current examples of dislocation-driven nanowire growth, the screw dislocations that propagate one-dimensional growth originate from spontaneously formed highly defective "seed" crystals. Here we intentionally utilize screw dislocations from defect-rich gallium nitride (GaN) thin films to propagate dislocation-driven growth, demonstrating epitaxial growth of zinc oxide (ZnO) nanowires directly from aqueous solution. Atomic force microscopy confirms screw dislocations are present on the native GaN surface and ZnO nanowires grow directly from dislocation etch pits of heavily etched GaN surfaces. Furthermore, transmission electron microscopy confirms the existence of axial dislocations. Eshelby twist in the resulting ZnO nanowires was confirmed using bright-/dark-field imaging and twist contour analysis. These results further confirm the connection between dislocation source and nanowire growth. This may eventually lead to defect engineering strategies for rationally designed catalyst-free dislocation-driven nanowire growth for specific applications.

  1. Structural and optical studies of GaN pn-junction with AlN buffer layer grown on Si (111) by RF plasma enhanced MBE

    Energy Technology Data Exchange (ETDEWEB)

    Yusoff, Mohd Zaki Mohd; Hassan, Zainuriah; Woei, Chin Che; Hassan, Haslan Abu; Abdullah, Mat Johar [Nano-Optoelectronics Research and Technology Laboratory School of Physics, Universiti Sains Malaysia, 11800 Penang, Malaysia and Department of Applied Sciences Universiti Teknologi MARA (UiTM) 13500 Permatang Pauh, Penang (Malaysia); Department of Applied Sciences Universiti Teknologi MARA (UiTM) 13500 Permatang Pauh, Penang (Malaysia)

    2012-06-29

    GaN pn-junction grown on silicon substrates have been the focus in a number of recent reports and further effort is still necessary to improve its crystalline quality for practical applications. GaN has the high n-type background carrier concentration resulting from native defects commonly thought to be nitrogen vacancies. In this work, we present the growth of pn-junction of GaN on Si (111) substrate using RF plasma-enhanced molecular beam epitaxy (MBE). Both of the layers show uniformity with an average thickness of 0.709 {mu}m and 0.095 {mu}m for GaN and AlN layers, respectively. The XRD spectra indicate that no sign of cubic phase of GaN are found, so it is confirmed that the sample possessed hexagonal structure. It was found that all the allowed Raman optical phonon modes of GaN, i.e. the E2 (low), E1 (high) and A1 (LO) are clearly visible.

  2. Interface characterization of atomic layer deposited high-k on non-polar GaN

    Science.gov (United States)

    Jia, Ye; Zeng, Ke; Singisetti, Uttam

    2017-10-01

    The interface properties between dielectrics and semiconductors are crucial for electronic devices. In this work, we report the electrical characterization of the interface properties between atomic layer deposited Al2O3 and HfO2 on non-polar a-plane ( 11 2 ¯ 0 ) and m-plane ( 1 1 ¯ 00 ) GaN grown by hybrid vapor phase epitaxy. A metal oxide semiconductor capacitor (MOSCAP) structure was used to evaluate the interface properties. The impact of annealing on the interface properties was also investigated. The border trap in the oxide, characterized by the capacitance-voltage (C-V) hysteresis loop, was low. The interface state density (Dit), extracted using the ac conductance method, is in the range of 0.5 × 1012/cm2 eV to 7.5 × 1011/cm2 eV within an energy range from 0.2 eV to 0.5 eV below the conduction band minimum. The m-plane GaN MOSCAPs exhibited better interface properties than the a-plane GaN MOSCAPs after annealing. Without annealing, Al2O3 dielectrics had higher border trap density and interface state density compared to HfO2 dielectrics. However, the annealing had different impacts on Al2O3 dielectrics as compared to HfO2. Our results showed that the annealing degraded the quality of the interface in HfO2, but it improved the quality of the interface in Al2O3 devices. The annealing also reduced the positive trapped oxide charge, resulting in a shift of C-V curves towards the positive bias region.

  3. Integration of GaN Crystals on Micropatterned Si(001) Substrates by Plasma-Assisted Molecular Beam Epitaxy

    Science.gov (United States)

    Isa, Fabio; Cheze, Caroline; Siekacz, Marcin; Hauswald, Christian; Lähnemann, Jonas; Fernandez-Garrido, Sergio; Kreiliger, Thomas; Ramsteiner, Manfred; Dasilva, Yadira Arroyo Rojas; Brandt, Oliver; Isella, Giovanni; Erni, Rolf; Calarco, Raffaella; Riechert, Henning; Miglio, Leo

    2015-10-01

    We present an innovative approach to integrate arrays of isolated, strain-free GaN crystals on patterned Si substrates. First, micrometer-sized pillars are patterned onto Si(0 0 1) substrates. Subsequently, 2.5 mu m Si substrates are deposited by low-energy plasma-enhanced chemical vapor deposition, forming crystals mostly bounded by {1 1 1}, {1 1 3}, and {15 3 23} facets. Plasma-assisted molecular beam epitaxy is then used for GaN deposition. GaN crystals with slanted {0 0 0 1} facets having a root-mean-square surface roughness of 0.7 nm are obtained for a deposited material thickness of >3 mu m. Microphotoluminescence measurements performed at room and cryogenic temperature show no yellow luminescence and a neutral donor-bound A exciton transition at 3.471 eV (10 K) with a full width at half-maximum of 10 meV. Microphotoluminescence and micro-Raman spectra reveal that GaN grown on Si pillars is strain-free. Our results indicate that the shape of GaN crystals can be tuned by the pattern periodicity and that a reduction of threading dislocations is achieved in their top part.

  4. TEM studies of laterally overgrown GaN layers grown in polar and non-polar directions

    Science.gov (United States)

    Liliental-Weber, Z.; Zakharov, D.; Wagner, B.; Davis, R. F.

    2006-02-01

    Transmission electron microscopy (TEM) was used to study pendeo-epitaxial GaN layers grown on polar and non-polar 4H SiC substrates. The structural quality of the overgrown layers was evaluated using a number of TEM methods. Growth of pendeo-epitaxial layers on polar substrates leads to better structural quality of the overgrown areas, however edge-on dislocations are found at the meeting fronts of two wings. Some misorientation between the "seed" area and wing area was detected by Convergent Beam Electron Diffraction. Growth of pendeo-epitaxial layers on non-polar substrates is more difficult. Two wings on the opposite site of the seed area grow in two different polar directions with different growth rates and wings grown with Ga polarity are 17 times wider than wings grown with N-polarity, making coalescence of these layers difficult. Most dislocations in a wing grown with Ga polarity bend in a direction parallel to the substrate, but some of them also propagate to the sample surface. Stacking faults formed on the c-plane and prismatic plane occasionally were found in the wings. Some misorientation between the wings and seed was detected using Large Angle Convergent Beam Diffraction.

  5. Formation of helical dislocations in ammonothermal GaN substrate by heat treatment

    Science.gov (United States)

    Horibuchi, Kayo; Yamaguchi, Satoshi; Kimoto, Yasuji; Nishikawa, Koichi; Kachi, Tetsu

    2016-03-01

    GaN substrate produced by the basic ammonothermal method and an epitaxial layer on the substrate was evaluated using synchrotron radiation x-ray topography and transmission electron microscopy. We revealed that the threading dislocations present in the GaN substrate are deformed into helical dislocations and the generation of the voids by heat treatment in the substrate for the first observation in the GaN crystal. These phenomena are formed by the interactions between the dislocations and vacancies. The helical dislocation was formed in the substrate region, and not in the epitaxial layer region. Furthermore, the evaluation of the influence of the dislocations on the leakage current of Schottky barrier diodes fabricated on the epitaxial layer is discussed. The dislocations did not affect the leakage current characteristics of the epitaxial layer. Our results suggest that the deformation of dislocations in the GaN substrate does not adversely affect the epitaxial layer.

  6. DFT modeling of carbon incorporation in GaN(0001) and GaN(000 1 \\xAF ) metalorganic vapor phase epitaxy

    Science.gov (United States)

    Kempisty, Pawel; Kangawa, Yoshihiro; Kusaba, Akira; Shiraishi, Kenji; Krukowski, Stanislaw; Bockowski, Michal; Kakimoto, Koichi; Amano, Hiroshi

    2017-10-01

    The carbon incorporation mechanism in GaN(0001) and GaN(000 1 ¯) during MOVPE was investigated using density functional theory (DFT) calculations. The results confirm that the crucial factors for carbon incorporation are Fermi level pinning and accompanying surface band bending. In addition, the lattice symmetry has a strong dependence on the stability of carbon in a few subsurface layers, which results from interactions between the impurities and surface states. It was shown that these effects are responsible for facilitating or hindering the incorporation of impurities and dopants. The influence of diluent gas species (hydrogen or nitrogen) on carbon incorporation was discussed.

  7. Investigation of the structural defects in GaN thin films grown by organometallic vapor phase epitaxy

    Science.gov (United States)

    Choi, J.-H.; Lim, S.-J.; Cho, M.-S.; Cho, N.-H.; Chung, S.-J.; Sohn, C.-S.

    2003-02-01

    GaN thin films were prepared on {0001} planes of sapphire substrates by organometallic vapor phase epitaxy (OMVPE) techniques. The crystall orgaphic relation between the film and the substrate as well as the structural features of the defects in the film were investigated by transmission electron microscopy (TEM). Epitaxial relationship was observed in the GaN/sapphire heterostructure prepared in this investigation; (0001) GaN//(0001) sapphire;[ {01bar 10} ] GaN//[ {bar 12bar 10} ] sapphire. Dislocations of Burgers vectorbar b = {1/3} [ {2bar 1bar 10} ] were observed in the film; the propagation behavior of the dislocations exhibits a slip system{ {10bar 10} }< {2bar 1bar 10} rangle is operative in the film. Inversion domain boundary (IDB) facets lying parallel to{ {01bar 10} } and{ {bar 12bar 10} } planes were observed; the type of anti-site bonds (Ga-Ga, N-N) is altemate along these IDB planes, keeping the simple stoichiometry of the compound.

  8. Band offsets of La2O3 on (0001) GaN grown by reactive molecular-beam epitaxy

    Science.gov (United States)

    Ihlefeld, Jon F.; Brumbach, Michael; Atcitty, Stanley

    2013-04-01

    La2O3 films were prepared on (0001)-oriented GaN substrates via reactive molecular-beam epitaxy. Film orientation and phase were assessed using reflection high-energy electron and X-ray diffraction. Films were observed to grow as predominantly hexagonal La2O3 for thicknesses less than 10 nm while film thickness greater than 10 nm favored mixed cubic and hexagonal symmetries. Band offsets were characterized by X-ray photoelectron spectroscopy on hexagonally symmetric films and valence band offsets of 0.63 ± 0.04 eV at the La2O3/GaN interface were measured. A conduction band offset of approximately 1.5 eV could be inferred from the measured valence band offset.

  9. Synthesis and characterization of a liquid Eu precursor (EuCp{sup pm}{sub 2}) allowing for valence control of Eu ions doped into GaN by organometallic vapor phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Mitchell, Brandon, E-mail: bmitchell@wcupa.edu [Department of Physics, West Chester University, West Chester, PA, 19383 (United States); Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, 565-0871 (Japan); Koizumi, Atsushi; Nunokawa, Takumi; Wakamatsu, Ryuta; Lee, Dong-gun; Saitoh, Yasuhisa; Timmerman, Dolf [Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, 565-0871 (Japan); Kuboshima, Yoshinori; Mogi, Takayuki; Higashi, Shintaro; Kikukawa, Kaoru [Kojundo Chemical Laboratory Co., Ltd., 5-1-28 Chiyoda, Sakado, Saitama, 350-0284 (Japan); Ofuchi, Hironori; Honma, Tetsuo [Japan Synchrotron Radiation Research Institute (JASRI/SPring-8), 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo, 679-5198 (Japan); Fujiwara, Yasufumi, E-mail: fujiwara@mat.eng.osaka-u.ac.jp [Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka, 565-0871 (Japan)

    2017-06-01

    A liquid Eu precursor, bis(normal-propyl-tetramethylcyclopentadienyl)europium has been synthesized. This precursor exists as a liquid at temperatures higher than 49 °C, has a moderately high vapor pressure, contains no oxygen in its molecular structure, and can be distilled to high purity. These properties make it ideal for doping using a chemical vapor or atomic layer deposition method, and provide a degree of control previously unavailable. As a precursor the Eu exists in the divalent valance state, however, once doped into GaN by organometallic vapor phase epitaxy, the room-temperature photoluminescence of the Eu-doped GaN exhibited the typical red emission due to the intra-4f shell transition of trivalent Eu. After variation of the growth temperature, it was found that divalent Eu could be stabilized in the GaN matrix. By tuning the Fermi level through donor doping, the ratio of Eu{sup 2+} to Eu{sup 3+} could be controlled. The change in valence state of the Eu ions was confirmed using X-ray absorption near-edge structure. - Highlights: • A liquid Eu precursor was synthesized and its properties were characterized. • Precursor has a low melting point and a moderately high vapor pressure. • Does not contain oxygen in its molecular structure. • Eu can changed its valance state when incorporated into GaN. • Valence state of Eu in GaN can be controlled by donor doping.

  10. Steady-State and Transient Photoconductivity in c-Axis GaN Nanowires Grown by Nitrogen-Plasma-Assisted Molecular Beam Epitaxy

    Science.gov (United States)

    2010-02-01

    Wide-bandgap III- nitride nanowires NWs are gaining increased attention for applications involving nanophotonics and nanoelectronics.1–3 GaN NW...results in a greater barrier to thermionic emission. This approximate model neglects other possible trap states, tunneling of carri- ers through the...Steady-state and transient photoconductivity in c-axis GaN nanowires grown by nitrogen-plasma-assisted molecular beam epitaxy N. A. Sanford,1,a P. T

  11. Halide vapor phase epitaxy of thick GaN films on ScAlMgO4 substrates and their self-separation for fabricating freestanding wafers

    Science.gov (United States)

    Ohnishi, Kazuki; Kanoh, Masaya; Tanikawa, Tomoyuki; Kuboya, Shigeyuki; Mukai, Takashi; Matsuoka, Takashi

    2017-10-01

    Halide vapor phase epitaxy of thick GaN films was demonstrated on ScAlMgO4 (SCAM) substrates, and their self-separation was achieved. The 320-µm-thick GaN film was self-separated from the SCAM substrate during the cooling process after the growth. This separation phenomenon occurred because of both the c-plane cleavability of SCAM and the difference in the thermal-expansion coefficients between GaN and SCAM. The dark-spot densities for the GaN films on the SCAM substrates were approximately 30% lower than those on sapphire substrates. These results indicate that SCAM substrates are promising for fabricating a high-quality freestanding GaN wafer at a low cost.

  12. Characteristics of nucleation layer and epitaxy in GaN/sapphire heterostructures

    Science.gov (United States)

    Narayan, J.; Pant, Punam; Chugh, A.; Choi, H.; Fan, J. C. C.

    2006-03-01

    We present the details of GaN nucleation layer grown on (0001) sapphire substrates below 600 °C by metal organic chemical vapor deposition. These films have cubic (c-GaN) zinc blende structure which starts to transform into a hexagonal (h-GaN) wurtzite structure upon annealing around 650 °C and above. The films deposited above 700 °C by pulsed laser deposition directly on sapphire substrate showed the wurtzite structure. Both c-GaN and h-GaN films grow epitaxially on (0001) sapphire substrates via domain matching epitaxy, where integral multiples of planes match across the film-substrate interface. The c-GaN has the following epitaxial relationship: c-GaN∥sap, c-GaN∥sap, and c-GaN∥sap. In terms of planar matching, (220) planes of c-GaN match with (30-30) planes of sapphire, and 1/3(422) planes of c-GaN match with (-2110) planes of sapphire in the perpendicular direction. The transformation from c-GaN into h-GaN involves the transformation of (220) planes of c-GaN into (-2110) planes of h-GaN and 1/3(422) planes of c-GaN into (30-30) planes of h-GaN, and the epitaxial relationship changes to h-GaN∥sap and h-GaN∥sap. In terms of planar matching epitaxy, (-2110) planes of h-GaN match with (30-30) planes of sapphire, and, in the perpendicular direction, (30-30) planes of h-GaN match with (-2110) planes of sapphire. This epitaxial relationship is known as 30° or 90° rotation. It is interesting to note that relative spacing for c-GaN as well as h-GaN planes remains the same during this transformation because of a(c-GaN)=√2a(h-GaN)=√3c(h-GaN)/2 equivalence between lattice constants of cubic and hexagonal structures. The transformation from cubic to hexagonal structure can occur via insertion or removal of stacking faults in {111} planes of c-GaN and {0001} planes of h-GaN. The hexagonal structure is preferred as a template for higher-temperature growth, however, the cubic structure, which is a defective hexagonal with stacking faults in alternate layers

  13. GaN Schottky diodes with single-crystal aluminum barriers grown by plasma-assisted molecular beam epitaxy

    Science.gov (United States)

    Tseng, H. Y.; Yang, W. C.; Lee, P. Y.; Lin, C. W.; Cheng, Kai-Yuan; Hsieh, K. C.; Cheng, K. Y.; Hsu, C.-H.

    2016-08-01

    GaN-based Schottky barrier diodes (SBDs) with single-crystal Al barriers grown by plasma-assisted molecular beam epitaxy are fabricated. Examined using in-situ reflection high-energy electron diffractions, ex-situ high-resolution x-ray diffractions, and high-resolution transmission electron microscopy, it is determined that epitaxial Al grows with its [111] axis coincident with the [0001] axis of the GaN substrate without rotation. In fabricated SBDs, a 0.2 V barrier height enhancement and 2 orders of magnitude reduction in leakage current are observed in single crystal Al/GaN SBDs compared to conventional thermal deposited Al/GaN SBDs. The strain induced piezoelectric field is determined to be the major source of the observed device performance enhancements.

  14. Separation of Ga-polar GaN layer from Si substrate by wet chemical etching

    Science.gov (United States)

    Shubina, K. Yu; Berezovskaya, T. N.; Mokhov, D. V.; Mizerov, A. M.; Nikitina, E. V.

    2017-11-01

    In this work the effects of H3PO4:CH3COOH:HNO3:HF etching solution taken with different concentrations to the Ga-polar GaN/SixNy/Si(111) epitaxial structures is investigated. Possibility of at least partial separation of Ga-polar GaN film from the silicon substrate without any GaN surface morphology changes by the selected etchants is demonstrated. The etching process mechanism is shown. Resistivity of the photoresist mask to etchants used in the experiments is found.

  15. Self-organization of dislocation-free, high-density, vertically aligned GaN nanocolumns involving InGaN quantum wells on graphene/SiO2 covered with a thin AlN buffer layer.

    Science.gov (United States)

    Hayashi, Hiroaki; Konno, Yuta; Kishino, Katsumi

    2016-02-05

    We demonstrated the self-organization of high-density GaN nanocolumns on multilayer graphene (MLG)/SiO2 covered with a thin AlN buffer layer by RF-plasma-assisted molecular beam epitaxy. MLG/SiO2 substrates were prepared by the transfer of CVD graphene onto thermally oxidized SiO2/Si [100] substrates. Employing the MLG with an AlN buffer layer enabled the self-organization of high-density and vertically aligned nanocolumns. Transmission electron microscopy observation revealed that no threading dislocations, stacking faults, or twinning defects were included in the self-organized nanocolumns. The photoluminescence (PL) peak intensities of the self-organized GaN nanocolumns were 2.0-2.6 times higher than those of a GaN substrate grown by hydride vapor phase epitaxy. Moreover, no yellow luminescence or ZB-phase GaN emission was observed from the nanocolumns. An InGaN/GaN MQW and p-type GaN were integrated into GaN nanocolumns grown on MLG, displaying a single-peak PL emission at a wavelength of 533 nm. Thus, high-density nitride p-i-n nanocolumns were fabricated on SiO2/Si using the transferred MLG interlayer, indicating the possibility of developing visible nanocolumn LEDs on graphene/SiO2.

  16. Microstructures of GaN thin films grown on graphene layers.

    Science.gov (United States)

    Yoo, Hyobin; Chung, Kunook; Choi, Yong Seok; Kang, Chan Soon; Oh, Kyu Hwan; Kim, Miyoung; Yi, Gyu-Chul

    2012-01-24

    Plan-view and cross-sectional transmission electron microscopy images show the microstructural properties of GaN thin films grown on graphene layers, including dislocation types and density, crystalline orientation and grain boundaries. The roles of ZnO nanowalls and GaN intermediate layers in the heteroepitaxial growth of GaN on graphene, revealed by cross-sectional transmission electron microscopy, are also discussed. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  17. Threading dislocation reduction in three-dimensionally grown GaN islands on Si (111) substrate with AlN/AlGaN buffer layers

    Science.gov (United States)

    Chang, Shane; Lung Wei, Lin; Tung Luong, Tien; Chang, Ching; Chang, Li

    2017-09-01

    Three-dimensional GaN island growth without any masks was first introduced under high pressure in metalorganic chemical vapor deposition after the growth of AlN and AlGaN buffer layers on Si (111) substrate, followed by two-dimensional GaN growth to form a continuous GaN film with improvement of the crystalline quality and surface smoothness. X-ray diffraction and cross-sectional scanning transmission electron microscopy analyses show that a high-quality GaN film can be achieved by bending of edge threading dislocations (TDs) and the formation of dislocation half-loops. It is observed that most of edge TDs bend 90° from the growth direction along c-axis, whereas mixed TDs bend about 30° towards the inclined sidewall facets of the islands. Consequently, a 1.2 μm thick GaN epitaxial film with a low threading dislocation density of 2.5 × 108 cm-2 and a smooth surface of 0. 38 nm roughness can be achieved on Si substrate.

  18. Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures

    Energy Technology Data Exchange (ETDEWEB)

    Nepal, Neeraj; Anderson, Virginia R.; Hite, Jennifer K.; Eddy, Charles R.

    2015-08-31

    We report the growth and characterization of III-nitride ternary thin films (Al{sub x}Ga{sub 1−x}N, In{sub x}Al{sub 1−x}N and In{sub x}Ga{sub 1−x}N) at ≤ 500 °C by plasma assisted atomic layer epitaxy (PA-ALE) over a wide stoichiometric range including the range where phase separation has been an issue for films grown by molecular beam epitaxy and metal organic chemical vapor deposition. The composition of these ternaries was intentionally varied through alterations in the cycle ratios of the III-nitride binary layers (AlN, GaN, and InN). By this digital alloy growth method, we are able to grow III-nitride ternaries by PA-ALE over nearly the entire stoichiometry range including in the spinodal decomposition region (x = 15–85%). These early efforts suggest great promise of PA-ALE at low temperatures for addressing miscibility gap challenges encountered with conventional growth methods and realizing high performance optoelectronic and electronic devices involving ternary/binary heterojunctions, which are not currently possible. - Highlights: • III-N ternaries grown at ≤ 500 °C by plasma assisted atomic layer epitaxy • Growth of InGaN and AlInN in the spinodal decomposition region (15–85%) • Epitaxial, smooth and uniform III-N film growth at low temperatures.

  19. Selective-area growth of GaN nanowires on SiO{sub 2}-masked Si (111) substrates by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Kruse, J. E.; Doundoulakis, G. [Department of Physics, University of Crete, P. O. Box 2208, 71003 Heraklion (Greece); Institute of Electronic Structure and Laser, Foundation for Research and Technology–Hellas, N. Plastira 100, 70013 Heraklion (Greece); Lymperakis, L. [Max-Planck-Institut für Eisenforschung, Max-Planck-Straße 1, 40237 Düsseldorf (Germany); Eftychis, S.; Georgakilas, A., E-mail: alexandr@physics.uoc.gr [Department of Physics, University of Crete, P. O. Box 2208, 71003 Heraklion (Greece); Adikimenakis, A.; Tsagaraki, K.; Androulidaki, M.; Konstantinidis, G. [Institute of Electronic Structure and Laser, Foundation for Research and Technology–Hellas, N. Plastira 100, 70013 Heraklion (Greece); Olziersky, A.; Dimitrakis, P.; Ioannou-Sougleridis, V.; Normand, P. [Institute of Nanoscience and Nanotechnology, NCSR Demokritos, Patriarchou Grigoriou and Neapoleos 27, 15310 Aghia Paraskevi, Athens (Greece); Koukoula, T.; Kehagias, Th.; Komninou, Ph. [Department of Physics, Aristotle University of Thessaloniki, 54124 Thessaloniki (Greece)

    2016-06-14

    We analyze a method to selectively grow straight, vertical gallium nitride nanowires by plasma-assisted molecular beam epitaxy (MBE) at sites specified by a silicon oxide mask, which is thermally grown on silicon (111) substrates and patterned by electron-beam lithography and reactive-ion etching. The investigated method requires only one single molecular beam epitaxy MBE growth process, i.e., the SiO{sub 2} mask is formed on silicon instead of on a previously grown GaN or AlN buffer layer. We present a systematic and analytical study involving various mask patterns, characterization by scanning electron microscopy, transmission electron microscopy, and photoluminescence spectroscopy, as well as numerical simulations, to evaluate how the dimensions (window diameter and spacing) of the mask affect the distribution of the nanowires, their morphology, and alignment, as well as their photonic properties. Capabilities and limitations for this method of selective-area growth of nanowires have been identified. A window diameter less than 50 nm and a window spacing larger than 500 nm can provide single nanowire nucleation in nearly all mask windows. The results are consistent with a Ga diffusion length on the silicon dioxide surface in the order of approximately 1 μm.

  20. Direct growth of GaN layer on carbon nanotube-graphene hybrid structure and its application for light emitting diodes.

    Science.gov (United States)

    Seo, Tae Hoon; Park, Ah Hyun; Park, Sungchan; Kim, Yong Hwan; Lee, Gun Hee; Kim, Myung Jong; Jeong, Mun Seok; Lee, Young Hee; Hahn, Yoon-Bong; Suh, Eun-Kyung

    2015-01-19

    We report the growth of high-quality GaN layer on single-walled carbon nanotubes (SWCNTs) and graphene hybrid structure (CGH) as intermediate layer between GaN and sapphire substrate by metal-organic chemical vapor deposition (MOCVD) and fabrication of light emitting diodes (LEDs) using them. The SWCNTs on graphene act as nucleation seeds, resulting in the formation of kink bonds along SWCNTs with the basal plane of the substrate. In the x-ray diffraction, Raman and photoluminescence spectra, high crystalline quality of GaN layer grown on CGH/sapphire was observed due to the reduced threading dislocation and efficient relaxation of residual compressive strain caused by lateral overgrowth process. When applied to the LED structure, the current-voltage characteristics and electroluminescence (EL) performance exhibit that blue LEDs fabricated on CGH/sapphire well-operate at high injection currents and uniformly emit over the whole emission area. We expect that CGH can be applied for the epitaxial growth of GaN on various substrates such as Si and MgO, which can be a great advantage in electrical and thermal properties of optical devices fabricated on them.

  1. Electron scattering due to dislocation wall strain field in GaN layers

    OpenAIRE

    Krasavin, S. E.

    2009-01-01

    The effect of edge-type dislocation wall strain field on the Hall mobility in n-type epitaxial GaN was theoretically investigated through deformation potential within the relaxation time approach. It was found that this channel of scattering can play a considerable role in the low-temperature transport at the certain set of the model parameters. The low temperature experimental data were fitted by including this mechanism of scattering along with ionized impurities and charge dislocation ones.

  2. Atomic Layer Epitaxial Growth of Gaas on Porous Silicon Substrate

    OpenAIRE

    Mohamed Lajnef; Afrah Bardaoui; Isabelle Sagne; Radwan Chtouroua; Hatem Ezzaouia

    2008-01-01

    GaAs thin film has been grown on porous silicon by metal organic chemical vapour deposition (MOCVD) for different growth temperatures using atomic layer epitaxy (ALE) technique. The morphology of GaAs layer was investigated by atomic force microscopy (AFM). The effect of growth temperature is studied using photoluminescence measurements (PL).The photoluminescence spectra revealed a dissymmetry form toward high energies attributed to strain effect resulting from the lattice mismatch between Ga...

  3. Defect structure of epitaxial layers of III nitrides as determined by analyzing the shape of X-ray diffraction peaks

    Science.gov (United States)

    Kyutt, R. T.

    2017-04-01

    The shape of X-ray diffraction epitaxial layers with high dislocation densities has been studied experimentally. Measurements with an X-ray diffractometer were performed in double- and triple-crystal setups with both Cu K α and Mo K α radiation. Epitaxial layers (GaN, AlN, AlGaN, ZnO, etc.) with different degrees of structural perfection grown by various methods on sapphire, silicon, and silicon carbide substrates have been examined. The layer thickness varied in the range of 0.5-30 μm. It has been found that the center part of peaks is well approximated by the Voigt function with different Lorentz fractions, while the wing intensity drops faster and may be represented by a power function (with the index that varies from one structure to another). A well-marked dependence on the ordering of dislocations was observed. The drop in intensity in the majority of structures with a regular system and regular threading dislocations was close to the theoretically predicted law Δθ-3; the intensity in films with a chaotic distribution decreased much faster. The dependence of the peak shape on the order of reflection, the diffraction geometry, and the epitaxial layer thickness was also examined.

  4. Characterization of GaN/AlGaN epitaxial layers grown by ...

    Indian Academy of Sciences (India)

    High resolution XRD (HRXRD) peaks show FWHM of 272 and 296 arcsec for the (0 0 0 2) plane of GaN and GaN in GaN/AlGaN respectively. For GaN buffer layer, the Hall mobility is 346 cm2/V-s and carrier concentration is 4.5 × 1016 /cm3. AFM studies on GaN buffer layer show a dislocation density of 2 × 108/cm2 by wet ...

  5. Growth and coalescence control of inclined c-axis polar and semipolar GaN multilayer structures grown on Si(111), Si(112), and Si(115) by metalorganic vapor phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Szymański, Tomasz, E-mail: tomasz.szymanski@pwr.edu.pl; Wośko, Mateusz; Paszkiewicz, Bartłomiej; Paszkiewicz, Bogdan; Paszkiewicz, Regina [The Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw (Poland); Sankowska, Iwona [The Institute of Electron Technology, Al. Lotnikow 32/46, 02-668 Warszawa (Poland)

    2016-09-15

    Herein, silicon substrates in alternative orientations from the commonly used Si(111) were used to enable the growth of polar and semipolar GaN-based structures by the metalorganic vapor phase epitaxy method. Specifically, Si(112) and Si(115) substrates were used for the epitaxial growth of nitride multilayer structures, while the same layer schemes were also deposited on Si(111) for comparison purposes. Multiple approaches were studied to examine the influence of the seed layers and the growth process conditions upon the final properties of the GaN/Si(11x) templates. Scanning electron microscope images were acquired to examine the topography of the deposited samples. It was observed that the substrate orientation and the process conditions allow control to produce an isolated GaN block growth or a coalesced layer growth, resulting in inclined c-axis GaN structures under various forms. The angles of the GaN c-axis inclination were determined by x-ray diffraction measurements and compared with the results obtained from the analysis of the atomic force microscope (AFM) images. The AFM image analysis method to determine the structure tilt was found to be a viable method to estimate the c-axis inclination angles of the isolated blocks and the not-fully coalesced layers. The quality of the grown samples was characterized by the photoluminescence method conducted at a wide range of temperatures from 77 to 297 K, and was correlated with the sample degree of coalescence. Using the free-excitation peak positions plotted as a function of temperature, analytical Bose-Einstein model parameters were fitted to obtain further information about the grown structures.

  6. Observation of reaction between a-type dislocations in GaN layer grown on 4-in. Si(111) substrate with AlGaN/AlN strained layer superlattice after dislocation propagation

    Science.gov (United States)

    Sugawara, Yoshihiro; Ishikawa, Yukari; Watanabe, Arata; Miyoshi, Makoto; Egawa, Takashi

    2017-06-01

    Dislocation reaction in a GaN layer grown on 4-in. Si(111) with AlGaN/AlN strained layer superlattice was observed by transmission electron microscopy. The reaction between a dislocation (b=1/3[ 1 2 bar 10 ]) and another dislocation (b =1/3[ 11 2 bar 0 ]) to form a dislocation segment (b =1/3[ 2 1 bar 1 bar 0 ]) was demonstrated by plan-view observation using weak-beam dark-field and large-angle convergent-beam electron diffraction methods. Observed reaction occurred with dislocation motion after dislocation propagation with epitaxial growth.

  7. Incorporation and optical properties of magnesium in cubic GaN epilayers grown by molecular beam epitaxy

    Science.gov (United States)

    As, D. J.; Simonsmeier, T.; Schöttker, B.; Frey, T.; Schikora, D.; Kriegseis, W.; Burkhardt, W.; Meyer, B. K.

    1998-09-01

    The incorporation and optical properties of Mg in cubic GaN (c-GaN) epilayers grown by rf plasma-assisted molecular beam epitaxy on (100) GaAs are investigated by secondary ion mass spectroscopy and low-temperature photoluminescence (PL). By varying the Mg flux by more than four orders of magnitude, the incorporation of Mg saturates at high Mg flux and is limited to a value of about 5×1018cm-3 due to the high volatility of Mg at growth temperature. In addition, we observe an accumulation of Mg at the GaN/GaAs interface due to a diffusion of Mg to the GaAs substrate. Low-temperature PL spectra reveal several well-separated lines. Besides a shallow acceptor level at EA≅0.230 eV, additional Mg-related deep defect levels indicate an incorporation of Mg at off-gallium sites or as complexes.

  8. Formation of GaN quantum dots by molecular beam epitaxy using NH{sub 3} as nitrogen source

    Energy Technology Data Exchange (ETDEWEB)

    Damilano, B., E-mail: bd@crhea.cnrs.fr; Brault, J.; Massies, J. [CRHEA-CNRS, Centre de Recherche sur l' Hétéro-Epitaxie et ses Applications, Centre National de la Recherche Scientifique, Rue B. Grégory, Valbonne 06560 (France)

    2015-07-14

    Self-assembled GaN quantum dots (QDs) in Al{sub x}Ga{sub 1−x}N (0.3 ≤ x ≤ 1) were grown on c-plane sapphire and Si (111) substrates by molecular beam epitaxy using ammonia as nitrogen source. The QD formation temperature was varied from 650 °C to 800 °C. Surprisingly, the density and size of QDs formed in this temperature range are very similar. This has been explained by considering together experimental results obtained from reflection high-energy electron diffraction, atomic force microscopy, and photoluminescence to discuss the interplay between thermodynamics and kinetics in the QD formation mechanisms. Finally, possible ways to better control the QD optical properties are proposed.

  9. Influence of lateral growth on the optical properties of GaN nanowires grown by hydride vapor phase epitaxy

    Science.gov (United States)

    Wu, Shaoteng; Wang, Liancheng; Yi, Xiaoyan; Liu, Zhiqiang; Wei, Tongbo; Yuan, Guodong; Wang, Junxi; Li, Jinmin

    2017-11-01

    GaN nanowires (NWs) are synthesized on Si (111) using vapor-liquid-solid hydride vapor phase epitaxy at low temperature (740-780 °C). We find that the flow rate of the GaCl (HCl) gas has a large impact on the NW lateral growth rate, which affects the NW morphology, axial growth rate, and optical property. Upon increasing the flow rate of GaCl, the uncatalyzed vapor solid lateral growth increases rapidly, leading to variations in NW morphology from wire-like to tower-like and rod-like. The photoluminescence spectrum shows a broad red luminescence (RL) at around 660 nm and a weak near-band-edge luminescence at around 400 nm when lateral growth is at a significant level. Furthermore, spatially resolved cathodoluminescence and high-resolution transmission electron microscopy observations confirmed that this RL originates from the defective lateral growth. Finally, by inhibiting the lateral growth, GaN NWs with a high aspect ratio and excellent crystal quality (no RL observed at around 660 nm) were successfully synthesized with a rapid growth rate of 170 μm/h.

  10. GaN Bulk Growth and Epitaxy from Ca-Ga-N Solutions Project

    Data.gov (United States)

    National Aeronautics and Space Administration — The innovations proposed here are Ka-band (38 GHz) group III-nitride power FETs and the dislocation density reducing epitaxial growth methods (LPE) needed for their...

  11. Characterization of GaN/AlGaN epitaxial layers grown by ...

    Indian Academy of Sciences (India)

    layers is studied by different characterization techniques. PL measurements indicate band ... in-situ interferometeric technique. The characterization of GaN and AlGaN layers was carried ... Hall measurement on GaN buffer layer shows a mobility (µH) of 346 cm2/V-s and carrier concentration (nH) of 4.5×1016/cm3, at room ...

  12. High-efficiency light-emitting diode with air voids embedded in lateral epitaxially overgrown GaN using a metal mask.

    Science.gov (United States)

    Cho, Chu-Young; Kwon, Min-Ki; Park, Il-Kyu; Hong, Sang-Hyun; Kim, Jae-Joon; Park, Seong-Eun; Kim, Sung-Tae; Park, Seong-Ju

    2011-07-04

    We report high-efficiency blue light-emitting diodes (LEDs) with air voids embedded in GaN. The air void structures were created by the lateral epitaxial overgrowth (LEO) of GaN using a tungsten mask. The optical output power was increased by 60% at an injection current of 20 mA compared with that of conventional LEDs without air voids. The enhancement is attributed to improved internal quantum efficiency because the air voids reduce the threading dislocation and strain in the LEO GaN epilayer. A ray-tracing simulation revealed that the path length of light escaping from the LED with air voids is much shorter because the air voids efficiently change the light path toward the top direction to improve the light extraction of the LED.

  13. Nitrogen incorporation into GaAsN and InGaAsN layers grown by liquid-phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Milanova, Malina; Koleva, Greta; Popov, Georgy [Central Laboratory of Applied Physics, Plovdiv (Bulgaria); Vitanov, Petko [Central Laboratory of Solar Energy and New Energy Sources, Sofia (Bulgaria); Terziyska, Penka [Semiconductor Research Laboratory, Department of Electrical Engineering, Lakehead University, Thunder Bay, ON (Canada)

    2013-04-15

    This paper presents the comparison of nitrogen incorporation in GaAsN and InGaAsN layers grown on GaAs substrate from Ga- and In-rich solution, respectively, by liquid-phase epitaxy. Polycrystalline GaN has been used as a source of nitrogen in two cases. The initial epitaxy temperature has been varied in the temperature range 600-550 C. Nitrogen content in Ga{sub 1-x}AsN{sub x} grown layers has been determined to be in the range 0.1-0.5%. Higher nitrogen incorporation efficiency has been found for quaternary InGaAsN layers grown under carefully chosen lattice matched conditions. The incorporation of nitrogen into GaAsN and InGaAsN layers has been study by vibrational mode absorption spectroscopy. Nitrogen-induced vibration mode near 472 cm{sup -1} has been registered in GaAsN samples. Preferential In-N bonds and the formation of N-centred In{sub 3}Ga{sub 1} clusters have been identified for lattice matched to GaAs epitaxial InGaAsN layers. Electrical properties of the samples have been characterized by temperature-dependent Hall effect measurements. Nominally undoped GaAsN and InGaAsN grown layers are n-type with Hall concentration about one order of magnitude higher in comparison to layers not containing nitrogen. Thermally activated increase in the free carrier concentration at temperatures higher than 150 K is observed which indicates the presence of N-related deep donor levels below dilute nitride conduction band edge. (copyright 2013 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  14. Structural and electrical analysis of epitaxial 2D/3D vertical heterojunctions of monolayer MoS2 on GaN

    Science.gov (United States)

    O'Regan, Terrance P.; Ruzmetov, Dmitry; Neupane, Mahesh R.; Burke, Robert A.; Herzing, Andrew A.; Zhang, Kehao; Birdwell, A. Glen; Taylor, DeCarlos E.; Byrd, Edward F. C.; Walck, Scott D.; Davydov, Albert V.; Robinson, Joshua A.; Ivanov, Tony G.

    2017-07-01

    Integration of two-dimensional (2D) and conventional (3D) semiconductors can lead to the formation of vertical heterojunctions with valuable electronic and optoelectronic properties. Regardless of the growth stacking mechanism implemented so far, the quality of the formed heterojunctions is susceptible to defects and contaminations mainly due to the complication involved in the transfer process. We utilize an approach that aims to eliminate the transfer process and achieve epitaxial vertical heterojunctions with low defect interfaces necessary for efficient vertical transport. Monolayers of MoS2 of approximately 2 μm domains are grown epitaxially by powder vaporization on GaN substrates forming a vertical 2D/3D heterojunction. Cross-sectional transmission electron microscopy (XTEM) is employed to analyze the in-plane lattice constants and van der Waals (vdW) gap between the 2D and 3D semiconductor crystals. The extracted in-plane lattice mismatch between monolayer MoS2 and GaN is only 1.2% which corresponds well to the expected mismatch between bulk MoS2 and GaN. The vdW gap between MoS2 and GaN, extracted from the XTEM measurements, is consistent with the vdW gap of 3.1 Å predicted by our first principles calculations. The effect of monolayer (1L) MoS2 on the electrical characteristics of 2D/3D semiconductor heterojunctions was studied using conductive atomic force microscopy (CAFM). The electrical current across the CAFM-tip/1L-MoS2/GaN vertical junctions is dominated by the tip/GaN interface of both n- and p-doped GaN. This electronic transparency of 1L-MoS2 tells us that a 2D crystal component has to be above a certain thickness before it can serve as an independent semiconductor element in 2D/3D heterojunctions.

  15. Epitaxial Gd2O3 on GaN and AlGaN: a potential candidate for metal oxide semiconductor based transistors on Si for high power application

    Science.gov (United States)

    Ghosh, Kankat; Das, S.; Khiangte, K. R.; Choudhury, N.; Laha, Apurba

    2017-11-01

    We report structural and electrical properties of hexagonal Gd2O3 grown epitaxially on GaN/Si (1 1 1) and AlGaN/GaN/Si(1 1 1) virtual substrates. GaN and AlGaN/GaN heterostructures were grown on Si(1 1 1) substrates by plasma assisted molecular beam epitaxy (PA-MBE), whereas the Gd2O3 layer was grown by the pulsed laser ablation (PLA) technique. Initial structural characterizations show that Gd2O3 grown on III-nitride layers by PLA, exhibit a hexagonal structure with an epitaxial relationship as {{≤ft[ 0 0 0 1 \\right]}G{{d2}{{O}3}}}||{{≤ft[ 0 0 0 1 \\right]}GaN} and {{≤ft[ 1 \\bar{1} 0 0 \\right]}G{{d2}{{O}3}}}||{{≤ft[ 1 \\bar{1} 0 0 \\right]}GaN} . X-ray photoelectron measurements of the valence bands revealed that Gd2O3 exhibits band offsets of 0.97 eV and 0.4 eV, for GaN and Al0.3Ga0.7N, respectively. Electrical measurements such as capacitance–voltage and leakage current characteristics further confirm that epi-Gd2O3 on III-nitrides could be a potential candidate for future metal-oxide-semiconductor (MOS)-based transistors also for high power applications in radio frequency range.

  16. Epitaxially Grown Layered MFI–Bulk MFI Hybrid Zeolitic Materials

    KAUST Repository

    Kim, Wun-gwi

    2012-11-27

    The synthesis of hybrid zeolitic materials with complex micropore-mesopore structures and morphologies is an expanding area of recent interest for a number of applications. Here we report a new type of hybrid zeolite material, composed of a layered zeolite material grown epitaxially on the surface of a bulk zeolite material. Specifically, layered (2-D) MFI sheets were grown on the surface of bulk MFI crystals of different sizes (300 nm and 10 μm), thereby resulting in a hybrid material containing a unique morphology of interconnected micropores (∼0.55 nm) and mesopores (∼3 nm). The structure and morphology of this material, referred to as a "bulk MFI-layered MFI" (BMLM) material, was elucidated by a combination of XRD, TEM, HRTEM, SEM, TGA, and N2 physisorption techniques. It is conclusively shown that epitaxial growth of the 2-D layered MFI sheets occurs in at least two principal crystallographic directions of the bulk MFI crystal and possibly in the third direction as well. The BMLM material combines the properties of bulk MFI (micropore network and mechanical support) and 2-D layered MFI (large surface roughness, external surface area, and mesoporosity). As an example of the uses of the BMLM material, it was incorporated into a polyimide and fabricated into a composite membrane with enhanced permeability for CO2 and good CO2/CH4 selectivity for gas separations. SEM-EDX imaging and composition analysis showed that the polyimide and the BMLM interpenetrate into each other, thereby forming a well-adhered polymer/particle microstructure, in contrast with the defective interfacial microstructure obtained using bare MFI particles. Analysis of the gas permeation data with the modified Maxwell model also allows the estimation of the effective volume of the BMLM particles, as well as the CO2 and CH4 gas permeabilities of the interpenetrated layer at the BMLM/polyimide interface. © 2012 American Chemical Society.

  17. Interruption-free growth of 10 μm-thick GaN film prepared on sputtered AlN/PSS template by hydride vapor phase epitaxy

    Science.gov (United States)

    Chen, Y. A.; Kuo, C. H.; Wu, J. P.; Chang, C. W.

    2015-09-01

    GaN films (10 μm-thick) of high crystalline quality were prepared on sputtered AlN/PSS template by hydride vapor phase epitaxy (HVPE). By introducing the two-step growth method into HVPE, one can reduce the steps in the procedure, realize uninterrupted growth, and improve the crystal quality of the films. The effects of initial GaN growth on the AlN/PSS template by HVPE were also investigated. In this study, 10 μm-thick GaN films prepared on sputtered AlN/PSS template by HVPE showed improved crystal quality using X-ray diffraction and etching pits density. Compared with conventional undoped GaN film grown by metal organic chemical vapor deposition, the full width at half maximum of the (0 0 2) and (1 0 2) peaks of GaN decreased from 450 arcsec to 290 arcsec and from 376 arcsec to 344 arcsec, respectively. Transmission electron microscopy results showed that the gaps observed between the convex regions would eventually turn into dislocations during coalescence, because the number of dislocations increased with the number of gaps observed between the convex regions after step-1 growth.

  18. Novel oxide buffer approach for GaN integration on Si(111) platform through Sc{sub 2}O{sub 3}/Y{sub 2}O{sub 3} bi-layer

    Energy Technology Data Exchange (ETDEWEB)

    Tarnawska, Lidia

    2012-12-19

    Motivation: Preparation of GaN virtual substrates on large-scale Si wafers is intensively pursued as a cost-effective approach for high power/high frequency electronics (HEMT's etc.) and optoelectronic applications (LED, LASER). However, the growth of high quality GaN layers on Si is hampered by several difficulties mainly related to a large lattice mismatch (-17%) and a huge difference in the thermal expansion coefficient (56%). As a consequence, GaN epitaxial layers grown on Si substrates show a high number of defects (threading dislocations etc.), which severely deteriorate the overall quality of the GaN films. Additionally, due to the different thermal expansion coefficients of the substrate and the film, um-thick GaN layers crack during post-growth cooling. To solve these integration problems, different semiconducting (e.g. AlN, GaAs, ZnO, HfN) and insulating (e.g. Al{sub 2}O{sub 3}, MgO, LiGaO{sub 2}) buffer layers, separating the Si substrate from the GaN film, are applied. Goal: In this thesis, a novel buffer approach for the integration of GaN on Si is proposed and investigated. The new approach employs Sc{sub 2}O{sub 3}/Y{sub 2}O{sub 3} bilayer templates as a step-graded buffer to reduce the lattice mismatch between GaN and the Si(111) substrate. According to the bulk crystal lattices, since the Y{sub 2}O{sub 3} has an in-plane lattice misfit of -2% to Si, Sc{sub 2}O{sub 3} -7% to Y{sub 2}O{sub 3}, the lattice misfit between GaN and the substrate can be theoretically reduced by about 50% from -17% (GaN/Si) to -8% (GaN/Sc{sub 2}O{sub 3}). Experimental: The GaN/Sc{sub 2}O{sub 3}/Y{sub 2}O{sub 3}/Si(111) heterostructures are prepared in a multichamber molecular beam epitaxy system on 4 inch Si(111) wafers. In order to obtain complete information on the structural quality of the oxide buffer as well as the GaN layer, synchrotron- and laboratory-based X-ray diffraction, transmission electron microscopy and photoluminescence measurements are performed. The

  19. Graphene Substrate for van der Waals Epitaxy of Layer-Structured Bismuth Antimony Telluride Thermoelectric Film.

    Science.gov (United States)

    Kim, Eun Sung; Hwang, Jae-Yeol; Lee, Kyu Hyoung; Ohta, Hiromichi; Lee, Young Hee; Kim, Sung Wng

    2017-02-01

    Graphene as a substrate for the van der Waals epitaxy of 2D layered materials is utilized for the epitaxial growth of a layer-structured thermoelectric film. Van der Waals epitaxial Bi 0.5 Sb 1.5 Te 3 film on graphene synthesized via a simple and scalable fabrication method exhibits good crystallinity and high thermoelectric transport properties comparable to single crystals. © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  20. Characterization of GaN layers by second harmonic generation and photoluminescence

    Science.gov (United States)

    Juodkazis, Saulius; Galeckas, Augustinas; Vaitkus, Juozas V.; Sakai, Shiro; Misawa, Hiroaki

    2001-03-01

    We have observed an apparent rotational anisotropy of the second harmonic generation (SHG) at signal at (lambda) = 405 nm back-reflected from the surface (0001) of 3 micrometers -thick GaN grown by metalorganic chemical vapor deposition (MOCVD). The focusing depth of 2 micrometers was aimed to probe the 10-15 nm-thick buffer layer where both cubic and hexagonal phases of GaN are coexisting. Typical angular dependency clearly indicated the presence of both isotropic and six-fold contributions. The isotropic I(2(omega ))(qq) component has a minor one-fold modulation due to a ca. 2 degree(s) disorientation of the top surface with respect to the hexagonal planes. We attribute the substantial isotropic component to the SHG yield from the bulk of GaN. The occurrence of six-fold I(2(omega )) (qq) anisotropy, however, indicates a complementary nonlinearities, most likely due to hexagonal phase, which is coexisting with the hexagonal one in the buffer layer region. In general, both surface and bulk nonlinearities are contributing to the reflected SH yield. The symmetry of surface can differ from that in the bulk, exhibiting a corresponding angular dependence of harmonic generation. SHG mapping of GaN (ooo1) surface was measured from the ablated pattern. Space-Time-Spectra resolved photoluminescence (PL) was used to characterize the InGaN layers and GaN/InGaN MQW laser structures. Two-photon absorption (TPA) excited mapping of the dislocation network in GaN layers is demonstrated.

  1. Study of epitaxial lateral overgrowth of GaN for application in the fabrication of optoelectronic devices

    Science.gov (United States)

    Berry Ann, N. J.; Rodak, L. E.; Kasarla, Kalyan; Yang, Nanying; Korakakis, D.

    2005-10-01

    In this research effort, epitaxial lateral overgrowth (ELOG) of GaN on sapphire was performed by low-pressure metalorganic chemical vapor deposition (MOCVD) in a horizontal reactor. All ELOG growths were stopped prior to complete coalescence, and the resulting cross-sections were characterized by scanning electron microscopy (SEM). Both vertical {1120} and inclined sidewalls were observed. Inclined {112n}sidewalls of various angles (n 2-2.2) were found as previously reported in the literature1. Both one-step and two-step ELOG processes were used to control the overgrowth geometry. It was confirmed that sidewall formation and growth rates are closely correlated with multiple parameters including temperature and V/III ratio1. It was also found that substrate rotation greatly influences sidewall evolution and vertical growth rate. A conceptual model was begun to completely describe the ELOG process in a horizontal reactor. It is speculated that the different sidewalls observed as a function of substrate orientation result from variation in the local V/III ratio. Once developed, the final model will be used to control the sidewalls in the growth of ELOG structures for the fabrication of novel optoelectronic devices.

  2. A visualization of threading dislocations formation and dynamics in mosaic growth of GaN-based light emitting diode epitaxial layers on (0001) sapphire

    Science.gov (United States)

    Ravadgar, P.; Horng, R. H.; Ou, S. L.

    2012-12-01

    A clear visualization of the origin and characteristics of threading dislocations (TDs) of GaN-based light emitting diode epitaxial layers on (0001) sapphire substrates have been carried out. Special experimental set up and chemical etchant along with field emission scanning electron microscopy are employed to study the dynamics of GaN TDs at different growth stages. Cross-sectional transmission electron microscopy analysis visualized the formation of edge TDs is arising from extension of coalescences at boundaries of different tilting-twining nucleation grains "mosaic growth." Etch pits as representatives of edge TDs are in agreement with previous theoretical models and analyses of TDs core position and characteristics.

  3. Low-resistivity m-plane freestanding GaN substrate with very low point-defect concentrations grown by hydride vapor phase epitaxy on a GaN seed crystal synthesized by the ammonothermal method

    Science.gov (United States)

    Kojima, Kazunobu; Tsukada, Yusuke; Furukawa, Erika; Saito, Makoto; Mikawa, Yutaka; Kubo, Shuichi; Ikeda, Hirotaka; Fujito, Kenji; Uedono, Akira; Chichibu, Shigefusa F.

    2015-09-01

    An m-plane freestanding GaN substrate satisfying both low resistivity (ρ = 8.5 × 10-3 Ω·cm) and a low point-defect concentration, being applicable to vertically conducting power-switching devices, was grown by hydride vapor phase epitaxy on a nearly bowing-free bulk GaN seed wafer synthesized by the ammonothermal method in supercritical ammonia using an acidic mineralizer. Its threading dislocation and basal-plane staking-fault densities were approximately 104 cm-2 and lower than 100 cm-1, respectively. A record-long fast-component photoluminescence lifetime of 2.07 ns at room temperature was obtained for the near-band-edge emission, reflecting a significantly low concentration of nonradiative recombination centers composed of Ga vacancies.

  4. GaN growth on silane exposed AlN seed layers

    Energy Technology Data Exchange (ETDEWEB)

    Ruiz-Zepeda, F. [Posgrado en Fisica de Materiales, Centro de Investigacion Cientifica y de Educacion Superior de Ensenada, Km. 107 Carret, Tijuana-Ensenada, C.P. 22860, Ensenada, B.C. (Mexico); Contreras, O. [Centro de Ciencias de la Materia Condesada, Universidad Nacional Autonoma de Mexico, Apdo. Postal 356, C.P. 22800, Ensenada, B.C. (Mexico); Dadgar, A.; Krost, A. [Otto-von-Guericke-Universitaet Magdeburg, FNW-IEP, Universitaetsplatz 2, 39106 Magdeburg (Germany)

    2008-07-01

    The microstructure and surface morphology of GaN films grown on AlN seed layers exposed to silane flow has been studied by TEM and AFM. The epilayers were grown on silicon(111) substrates by MOCVD. The AlN seed layer surface was treated at different SiH{sub 4} exposure times prior to the growth of the GaN film. A reduction in the density of threading dislocations is observed in the GaN films and their surface roughness is minimized for an optimal SiH{sub 4} exposure time between 75-90 sec. At this optimal condition a step-flow growth mode of GaN film is predominant. The improvement of the surface and structure quality of the epilayers is observed to be related to an annihilation process of threading dislocations done by SiN{sub x} masking. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  5. Growth and characterization of pendeo-epitaxial GaN (1 1 2¯ 0) on 4H-SiC (1 1 2¯ 0) substrates

    Science.gov (United States)

    Wagner, B. P.; Reitmeier, Z. J.; Park, J. S.; Bachelor, D.; Zakharov, D. N.; Liliental-Weber, Z.; Davis, R. F.

    2006-05-01

    Growth on AlN/4H-SiC (1 1 2¯ 0) substrates of coalesced, non-polar GaN (1 1 2¯ 0) films having volumes of material with reduced densities of dislocations and stacking faults has been achieved from etched stripes via the statistical and experimental determination of the effect of temperature and V/III ratio on the lateral and vertical growth rates of the GaN{0 0 0 1} faces combined with pendeo-epitaxy. AFM of the uncoalesced GaN(0 0 0 1) and GaN (0 0 0 1¯) vertical faces revealed growth steps with some steps terminating at dislocations on the former and a pitted surface without growth steps, indicative of decomposition, on the latter. Coalescence was achieved via (a) a two-step route and the parameters of (1) T=1100 °C and V/III=1323 for 40 min and (2) 1020 °C and V/III=660 for 40 min and (b) a one-step route that employed T=1020 °C and a V/III ratio=660 for 6 h. The densities of dislocations in the GaN grown vertically over and laterally from the (1 1 2¯ 0) stripes were ˜4×10 10 cm -2 and ˜2×10 8 cm -2, respectively; the densities of stacking fault in these volumes were ˜1×10 6 cm -1 and ˜2×10 4 cm -1, respectively. The defects in the wing material were observed primarily at the bottom of the film where lateral growth of the GaN occurred from the AlN and the SiC. Plan view AFM also revealed different microstructures and a reduction in the RMS roughness values from 1.2 to 0.95 nm in these respective regions.

  6. Epitaxial growth and properties of cubic group III-nitride layers

    Science.gov (United States)

    Schikora, D.; Schoettger, B.; As, Donat J.; Lischka, K.

    1997-06-01

    Single-phase cubic GaN and InN layers are grown by plasma assisted MBE. The temperature-dependence of the surface reconstruction is elaborated. The structural stability of the cubic growth in dependence of the growth stoichiometry is studied by RHEED measurements and numerical simulations of the experimental RHEED patterns. Growth oscillations on cubic GaN and during the growth of GaN-InN single quantum wells are recorded at nearly stoichiometric adatom coverage. Photoluminescence reveals the dominant optical transitions of cubic GaN and InN. Using in-situ RHEED to control the surface stoichiometry it is possible to grow N-stabilized layers resulting in intrinsic p-type GaN epilayers with hole concentrations of about p equals 1 X 1013 cm-3 and mobilities of about (mu) p equals 320 cm2/Vs, respectively.

  7. Substrate-induced magnetism in epitaxial graphene buffer layers.

    Science.gov (United States)

    Ramasubramaniam, A; Medhekar, N V; Shenoy, V B

    2009-07-08

    Magnetism in graphene is of fundamental as well as technological interest, with potential applications in molecular magnets and spintronic devices. While defects and/or adsorbates in freestanding graphene nanoribbons and graphene sheets have been shown to cause itinerant magnetism, controlling the density and distribution of defects and adsorbates is in general difficult. We show from first principles calculations that graphene buffer layers on SiC(0001) can also show intrinsic magnetism. The formation of graphene-substrate chemical bonds disrupts the graphene pi-bonds and causes localization of graphene states near the Fermi level. Exchange interactions between these states lead to itinerant magnetism in the graphene buffer layer. We demonstrate the occurrence of magnetism in graphene buffer layers on both bulk-terminated as well as more realistic adatom-terminated SiC(0001) surfaces. Our calculations show that adatom density has a profound effect on the spin distribution in the graphene buffer layer, thereby providing a means of engineering magnetism in epitaxial graphene.

  8. Structural characterization of thick (11 anti 22) GaN layers grown by HVPE on m-plane sapphire

    Energy Technology Data Exchange (ETDEWEB)

    Usikov, Alexander; Soukhoveev, Vitali; Shapovalov, Lisa; Syrkin, Alexander; Ivantsov, Vladimir; Scanlan, Bernard [Technologies and Devices International, Oxford Instruments Company, 12214 Plum Orchard Dr., Silver Spring, MD 20852 (United States); Nikiforov, Alexey [Department of Electrical and Computer Engineering, Boston University, 8 Saint Mary' s Street, Boston, MA 02215 (United States); Strittmatter, Andre; Johnson, Noble [Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto, CA 94304 (United States); Zheng, Jian-Guo [Materials Characterization Center, LEXI/Calit2, University of California, Irvine, CA 92697 (United States); Spiberg, Philippe; El-Ghoroury, Hussein [Ostendo Technologies, Inc., 6185 Paseo del Norte, Ste. 200, Carlsbad, CA 92011 (United States)

    2010-06-15

    This paper reports structural characterization of thick (11 anti 22)-oriented GaN layers by means of XRD, TEM, and micro- CL. The semi-polar (11 anti 22) GaN layers were grown on m-plane sapphire substrates by HVPE. Their structural quality improved with thickness. Threading dislocation density of 3 x 10{sup 8} cm{sup -2} and stacking faults density of 4 x 10{sup 4} cm{sup -1} were measured at the surface of 20 {mu}m thick (11 anti 22) GaN layers. The semi-polar GaN layers were used as template substrates to grow InGaN/GaN MQW heterostructures by MOCVD that demonstrated optically pumped lasing at 500 nm wavelength. The results demonstrate the longest wavelength yet reported for a photo-pumped laser on template substrates. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  9. Band offsets of La{sub 2}O{sub 3} on (0001) GaN grown by reactive molecular-beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Ihlefeld, Jon F.; Brumbach, Michael; Atcitty, Stanley [Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)

    2013-04-22

    La{sub 2}O{sub 3} films were prepared on (0001)-oriented GaN substrates via reactive molecular-beam epitaxy. Film orientation and phase were assessed using reflection high-energy electron and X-ray diffraction. Films were observed to grow as predominantly hexagonal La{sub 2}O{sub 3} for thicknesses less than 10 nm while film thickness greater than 10 nm favored mixed cubic and hexagonal symmetries. Band offsets were characterized by X-ray photoelectron spectroscopy on hexagonally symmetric films and valence band offsets of 0.63 {+-} 0.04 eV at the La{sub 2}O{sub 3}/GaN interface were measured. A conduction band offset of approximately 1.5 eV could be inferred from the measured valence band offset.

  10. Cross-stacked carbon nanotubes assisted self-separation of free-standing GaN substrates by hydride vapor phase epitaxy

    Science.gov (United States)

    Wei, Tongbo; Yang, Jiankun; Wei, Yang; Huo, Ziqiang; Ji, Xiaoli; Zhang, Yun; Wang, Junxi; Li, Jinmin; Fan, Shoushan

    2016-06-01

    We report a novel method to fabricate high quality 2-inch freestanding GaN substrate grown on cross-stacked carbon nanotubes (CSCNTs) coated sapphire by hydride vapor phase epitaxy (HVPE). As nanoscale masks, these CSCNTs can help weaken the interface connection and release the compressive stress by forming voids during fast coalescence and also block the propagation of threading dislocations (TDs). During the cool-down process, thermal stress-induced cracks are initiated at the CSCNTs interface with the help of air voids and propagated all over the films which leads to full self-separation of FS-GaN substrate. Raman and photoluminescence spectra further reveal the stress relief and crystalline improvement of GaN with CSCNTs. It is expected that the efficient, low cost and mass-producible technique may enable new applications for CNTs in nitride optoelectronic fields.

  11. Time-resolved photoluminescence and photoreflectance spectroscopy of GaN layers grown on SiN-treated sapphire substrate: Optical properties evolution at different growth stages

    Science.gov (United States)

    Bouzidi, M.; Soltani, S.; Chine, Z.; Rebey, A.; Shakfa, M. K.

    2017-11-01

    In this paper, we present a systematic study of the optical properties evolution of GaN films during the complete growth process on SiN-treated sapphire substrates by atmospheric pressure metalorganic vapor phase epitaxy. The growth process was monitored using in-situ laser reflectometry and was interrupted at different stages to obtain the studied samples. The obtained samples were ex-situ characterized by means of photoluminescence (PL), photoreflectance (PR) and time-resolved PL (TRPL) spectroscopies. The PL emission from the samples of the initial growth stages originates from nano-crystallite and defect states due to the 3D growth mode. However, with increasing layer thickness, the 2D growth mode is established, and the PL spectrum is dominated by free-exciton emission. The electric field extracted by applying the Franz-Keldysh oscillation (FKO) theory on the PR spectra shows a trend to decrease as the GaN layer thickness is increased. For fully coalesced layers, the FKO totally disappears, and the PR spectrum is dominated by free-exciton transitions. TRPL measurements demonstrate the contribution of two processes to the PL decay, i.e., fast and slow components. While the slow decay time reveals the same sensitivity to different types of dislocations (twist and tilt mosaics), the fast decay time is more affected by the twist mosaic than by the tilt one.

  12. Defects and nucleation of GaN layers on (0001) sapphire

    Science.gov (United States)

    Degave, F.; Ruterana, P.; Nouet, G.; Je, J. H.; Kim, C. C.

    2002-12-01

    The morphology and microstructural evolution of a nucleation layer are analysed using high-resolution transmission electron microscopy. Low-temperature nucleation of GaN on (0001) sapphire is investigated. Depositions were made for 20, 40, 60, 120 and 180 s at 560°C by metal-organic chemical vapour deposition. It is shown that the shortest deposition times give rise to the formation of cubic islands. Subsequently, the density and the size of the nucleated islands increase and they start to transform into wurtzite from the interface with the substrate. From the start, the nuclei contain misfit dislocations. At these early growth stages, the relaxation state changes from one island to another; this probably underlies the subsequent mosaïc growth of the high-temperature-active GaN layers.

  13. Electronic and optical characteristics of an m-plane GaN single crystal grown by hydride vapor phase epitaxy on a GaN seed synthesized by the ammonothermal method using an acidic mineralizer

    Science.gov (United States)

    Kojima, Kazunobu; Tsukada, Yusuke; Furukawa, Erika; Saito, Makoto; Mikawa, Yutaka; Kubo, Shuichi; Ikeda, Hirotaka; Fujito, Kenji; Uedono, Akira; Chichibu, Shigefusa F.

    2016-05-01

    Fundamental electronic and optical properties of a low-resistivity m-plane GaN single crystal, which was grown by hydride vapor phase epitaxy on a bulk GaN seed crystal synthesized by the ammonothermal method in supercritical ammonia using an acidic mineralizer, were investigated. The threading dislocation and basal-plane staking-fault densities of the crystal were around 104 cm-2 and less than 100 cm-1, respectively. Oxygen doping achieved a high electron concentration of 4 × 1018 cm-3 at room temperature. Accordingly, a photoluminescence (PL) band originating from the recombination of hot carriers was observed at low temperatures, even under weak excitation conditions. The simultaneous realization of low-level incorporation of Ga vacancies (VGa) less than 1016 cm-3 was confirmed by using the positron annihilation technique. Consistent with our long-standing claim that VGa complexes are the major nonradiative recombination centers in GaN, the fast-component PL lifetime of the near-band-edge emission at room temperature longer than 2 ns was achieved.

  14. Microstructure of GaN epitaxial films at different stages of the growth process on sapphire (0 0 0 1)

    Science.gov (United States)

    Vennegues, P.; Beaumont, B.; Vaille, M.; Gibart, P.

    1997-04-01

    The microstructure of GaN films at different stages of a classical two steps growth process is studied using TEM. The buffer layer grown at low temperature (600°C) exhibits a mixed cubic-hexagonal columnar microstructure. Numerous defects are present to accomodate the misorientations between micrograins. During the following annealing step up to 1050°C, the microstructure drastically changes: cubic islands remain on the top of a film with hexagonal structure. The buffer layer at this stage is still highly polycrystalline. The microstructure of micrometer thick films grown at 1050°C could be separated in two zones. Close to the interface with sapphire, misfit dislocations, basal stacking faults and nanocavities are observed. We propose a mechanism of relaxation of the strain due to the difference of thermal expansion coefficients which could explain the presence of stacking faults. The existence of nanocavities is supposed to be related to a contamination by oxygen. After a thickness of 0.5 μm, two types of threading defects remain: edge dislocations with {1}/{3} Burgers vector which accommodate slight misorientations between grains, and nanopipes. These nanopipes are identified as open core dislocations with (0 0 0 1) Burgers vector. They have an alternating behaviour: close core, open core. The microstructure of this bulk zone duplicates the microstructure of the buffer layer at a higher scale, pointing out the crucial importance of the first steps of the growth.

  15. Evolution of deep centers in GaN grown by hydride vapor phaseepitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Fang, Z.-Q.; Look, D.C.; Jasinski, J.; Benamara, M.; Liliental-Weber, Z.; Molnar, R.J.

    2001-04-18

    Deep centers and dislocation densities in undoped n GaN, grown by hydride vapor phase epitaxy (HVPE), were characterized as a function of the layer thickness by deep level transient spectroscopy and transmission electron microscopy, respectively. As the layer thickness decreases, the variety and concentration of deep centers increase, in conjunction with the increase of dislocation density. Based on comparison with electron irradiation induced centers, some dominant centers in HVPE GaN are identified as possible point defects.

  16. Suppression of the self-heating effect in GaN HEMT by few-layer graphene heat spreading elements

    Science.gov (United States)

    Volcheck, V. S.; Stempitsky, V. R.

    2017-11-01

    Self-heating has an adverse effect on characteristics of gallium nitride (GaN) high electron mobility transistors (HEMTs). Various solutions to the problem have been proposed, however, a temperature rise due to dissipated electrical power still hinders the production of high power and high speed GaN devices. In this paper, thermal management of GaN HEMT via few-layer graphene (FLG) heat spreading elements is investigated. It is shown that integration of the FLG elements on top of the device structure considerably reduces the maximum temperature and improves the DC and small signal AC performance.

  17. Improved performance of GaN based light emitting diodes with ex-situ sputtered AlN nucleation layers

    Directory of Open Access Journals (Sweden)

    Shuo-Wei Chen

    2016-04-01

    Full Text Available The crystal quality, electrical and optical properties of GaN based light emitting diodes (LEDs with ex-situ sputtered physical vapor deposition (PVD aluminum nitride (AlN nucleation layers were investigated. It was found that the crystal quality in terms of defect density and x-ray diffraction linewidth was greatly improved in comparison to LEDs with in-situ low temperature GaN nucleation layer. The light output power was 3.7% increased and the reverse bias voltage of leakage current was twice on LEDs with ex-situ PVD AlN nucleation layers. However, larger compressive strain was discovered in LEDs with ex-situ PVD AlN nucleation layers. The study shows the potential and constrain in applying ex-situ PVD AlN nucleation layers to fabricate high quality GaN crystals in various optoelectronics.

  18. Surface instability and associated roughness during conventional and pendeo-epitaxial growth of GaN(0 0 0 1) films via MOVPE

    Science.gov (United States)

    Roskowski, A. M.; Miraglia, P. Q.; Preble, E. A.; Einfeldt, S.; Davis, R. F.

    2002-05-01

    Investigations of the origins of surface roughening in GaN(0 0 0 1) have resulted in the development of a growth process route having an optimum temperature of 1020°C and a film thickness beyond 2.5 μm which results in films with the smoothest surface morphology. Atomic force microscopy (AFM) revealed uncoalesced GaN islands and hillocks for non-optimum temperatures below and above 1020°C, respectively. Uncoalesced islands were a result of insufficient lateral growth. Hillocks were a result of the rotation of heterogeneous steps formed at pure screw or mixed dislocations which terminated on the (0 0 0 1) surface. Growth of the latter features was controlled kinetically by temperature through adatom diffusion. The 10 6 cm -2 density of hillocks was reduced through growth on thick GaN templates and regions of pendeo-epitaxy (PE) overgrowth with lower pure screw or mixed dislocations. Smooth PE surfaces were obtained at temperatures that reduced the lateral to vertical growth rate but also retarded hillock growth that originated in the stripe regions. The (1 1 2¯ 0) PE sidewall surface was atomically smooth, with a root mean square roughness value of 0.17 nm, which was the noise limited resolution of the AFM measurements.

  19. Correlation of growth temperature with stress, defect states and electronic structure in an epitaxial GaN film grown on c-sapphire via plasma MBE.

    Science.gov (United States)

    Krishna, Shibin; Aggarwal, Neha; Mishra, Monu; Maurya, K K; Singh, Sandeep; Dilawar, Nita; Nagarajan, Subramaniyam; Gupta, Govind

    2016-03-21

    The relationship of the growth temperature with stress, defect states, and electronic structure of molecular beam epitaxy grown GaN films on c-plane (0001) sapphire substrates is demonstrated. A minimum compressively stressed GaN film is grown by tuning the growth temperature. The correlation of dislocations/defects with the stress relaxation is scrutinized by high-resolution X-ray diffraction and photoluminescence measurements which show a high crystalline quality with significant reduction in the threading dislocation density and defect related bands. A substantial reduction in yellow band related defect states is correlated with the stress relaxation in the grown film. Temperature dependent Raman analysis shows the thermal stability of the stress relaxed GaN film which further reveals a downshift in the E2 (high) phonon frequency owing to the thermal expansion of the lattice at elevated temperatures. Electronic structure analysis reveals that the Fermi level of the films is pinned at the respective defect states; however, for the stress relaxed film it is located at the charge neutrality level possessing the lowest electron affinity. The analysis demonstrates that the generated stress not only affects the defect states, but also the crystal quality, surface morphology and electronic structure/properties.

  20. Influence of the nucleation layer morphology and epilayer structure on the resistivity of GaN films grown on c-plane sapphire by MOCVD

    NARCIS (Netherlands)

    Grzegorczyk, A.P.; Macht, L.J.; Hageman, P.R.; Weyher, J.L.; Larsen, P.K.

    2005-01-01

    The influence of hydrogen and nitrogen carrier gases used during the preparation of the nucleation layer on the structural and electrical properties of GaN layers has been investigated. The GaN were grown on sapphire substrates using metal organic chemical vapor deposition. The nucleation layer

  1. GaN based nanorods for solid state lighting

    Energy Technology Data Exchange (ETDEWEB)

    Li Shunfeng; Waag, Andreas [Institute of Semiconductor Technology, Braunschweig University of Technology, 38106 Braunschweig (Germany)

    2012-04-01

    In recent years, GaN nanorods are emerging as a very promising novel route toward devices for nano-optoelectronics and nano-photonics. In particular, core-shell light emitting devices are thought to be a breakthrough development in solid state lighting, nanorod based LEDs have many potential advantages as compared to their 2 D thin film counterparts. In this paper, we review the recent developments of GaN nanorod growth, characterization, and related device applications based on GaN nanorods. The initial work on GaN nanorod growth focused on catalyst-assisted and catalyst-free statistical growth. The growth condition and growth mechanisms were extensively investigated and discussed. Doping of GaN nanorods, especially p-doping, was found to significantly influence the morphology of GaN nanorods. The large surface of 3 D GaN nanorods induces new optical and electrical properties, which normally can be neglected in layered structures. Recently, more controlled selective area growth of GaN nanorods was realized using patterned substrates both by metalorganic chemical vapor deposition (MOCVD) and by molecular beam epitaxy (MBE). Advanced structures, for example, photonic crystals and DBRs are meanwhile integrated in GaN nanorod structures. Based on the work of growth and characterization of GaN nanorods, GaN nanoLEDs were reported by several groups with different growth and processing methods. Core/shell nanoLED structures were also demonstrated, which could be potentially useful for future high efficient LED structures. In this paper, we will discuss recent developments in GaN nanorod technology, focusing on the potential advantages, but also discussing problems and open questions, which may impose obstacles during the future development of a GaN nanorod based LED technology.

  2. Ultraviolet light-absorbing and emitting diodes consisting of a p-type transparent-semiconducting NiO film deposited on an n-type GaN homoepitaxial layer

    Science.gov (United States)

    Nakai, Hiroshi; Sugiyama, Mutsumi; Chichibu, Shigefusa F.

    2017-05-01

    Gallium nitride (GaN) and related (Al,Ga,In)N alloys provide practical benefits in the production of light-emitting diodes (LEDs) and laser diodes operating in ultraviolet (UV) to green wavelength regions. However, obtaining low resistivity p-type AlN or AlGaN of large bandgap energies (Eg) is a critical issue in fabricating UV and deep UV-LEDs. NiO is a promising candidate for useful p-type transparent-semiconducting films because its Eg is 4.0 eV and it can be doped into p-type conductivity of sufficiently low resistivity. By using these technologies, heterogeneous junction diodes consisting of a p-type transparent-semiconducting polycrystalline NiO film on an n-type single crystalline GaN epilayer on a low threading-dislocation density, free-standing GaN substrate were fabricated. The NiO film was deposited by using the conventional RF-sputtering method, and the GaN homoepitaxial layer was grown by metalorganic vapor phase epitaxy. They exhibited a significant photovoltaic effect under UV light and also exhibited an electroluminescence peak at 3.26 eV under forward-biased conditions. From the conduction and valence band (EV) discontinuities, the NiO/GaN heterointerface is assigned to form a staggered-type (TYPE-II) band alignment with the EV of NiO higher by 2.0 eV than that of GaN. A rectifying property that is consistent with the proposed band diagram was observed in the current-voltage characteristics. These results indicate that polycrystalline NiO functions as a hole-extracting and injecting layer of UV optoelectronic devices.

  3. Nanostructured graded-index antireflection layer formation on GaN for enhancing light extraction from light-emitting diodes

    Science.gov (United States)

    Dylewicz, R.; Khokhar, A. Z.; Wasielewski, R.; Mazur, P.; Rahman, F.

    2012-05-01

    We describe the fabrication and characterization of a randomly etched gallium nitride (GaN) surface for enhancing light extraction from light-emitting diodes. Our technique uses silica spheres as nano-targets in a sputter-etch process and produces a fine-grained surface with features around 35 nm. The textured surface layer acts as a graded refractive index layer with antireflection properties. Measurements show that photoluminescence intensity from such treated surfaces on a GaN LED wafer increases 2.2 times over that from pristine surfaces. These findings are also supported by computer modelling studies described here.

  4. Growth kinetics and structural perfection of (InN){sub 1}/(GaN){sub 1–20} short-period superlattices on +c-GaN template in dynamic atomic layer epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Kusakabe, Kazuhide; Hashimoto, Naoki; Wang, Ke; Imai, Daichi [Center for SMART Green Innovation Research, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Itoi, Takaomi [Graduate School of Engineering, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Yoshikawa, Akihiko, E-mail: yoshi@faculty.chiba-u.jp [Center for SMART Green Innovation Research, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522 (Japan); Graduate School of Engineering, Kogakuin University, Hachioji, Tokyo 192-0015 (Japan)

    2016-04-11

    The growth kinetics and structural perfection of (InN){sub 1}/(GaN){sub 1–20} short-period superlattices (SPSs) were investigated with their application to ordered alloys in mind. The SPSs were grown on +c-GaN template at 650 °C by dynamic atomic layer epitaxy in conventional plasma-assisted molecular beam epitaxy. It was found that coherent structured InN/GaN SPSs could be fabricated when the thickness of the GaN barrier was 4 ML or above. Below 3 ML, the formation of SPSs was quite difficult owing to the increased strain in the SPS structure caused by the use of GaN as a template. The effective or average In composition of the (InN){sub 1}/(GaN){sub 4} SPSs was around 10%, and the corresponding InN coverage in the ∼1 ML-thick InN wells was 50%. It was found that the effective InN coverage in ∼1 ML-thick InN wells could be varied with the growth conditions. In fact, the effective In composition could be increased up to 13.5%, i.e., the corresponding effective InN coverage was about 68%, by improving the capping/freezing speed by increasing the growth rate of the GaN barrier layer.

  5. Process for forming epitaxial perovskite thin film layers using halide precursors

    Science.gov (United States)

    Clem, Paul G.; Rodriguez, Mark A.; Voigt, James A.; Ashley, Carol S.

    2001-01-01

    A process for forming an epitaxial perovskite-phase thin film on a substrate. This thin film can act as a buffer layer between a Ni substrate and a YBa.sub.2 Cu.sub.3 O.sub.7-x superconductor layer. The process utilizes alkali or alkaline metal acetates dissolved in halogenated organic acid along with titanium isopropoxide to dip or spin-coat the substrate which is then heated to about 700.degree. C. in an inert gas atmosphere to form the epitaxial film on the substrate. The YBCO superconductor can then be deposited on the layer formed by this invention.

  6. A novel GaN HEMT with double recessed barrier layer for high efficiency-energy applications

    Science.gov (United States)

    Jia, Hujun; Luo, Yehui; Wu, Qiuyuan; Yang, Yintang

    2017-11-01

    In this paper, a novel GaN HEMT with high efficiency-energy characteristic is proposed. Different from the conventional structure, the proposed structure contains double recessed barriers layer (DRBL) beside the gate. The key idea in this work is to improve the microwave output characteristics. The simulated results show that the drain saturation current and peak transconductance of DRBL GaN HEMT is slightly decreased, the transconductance saturation flatness is increased by 0.5 V and the breakdown voltage is also enhanced too. Due to the both recessed barrier layer, the gate-drain/gate-source capacitance is decreased by 6.3% and 11.3%, respectively. The RF simulated results show that the maximum oscillation frequency for DRBL GaN HEMT is increased from 57 GHz to 64 GHz and the saturation power density is 8.7 W/mm at 600 MHz, 6.9 W/mm at 1200 MHz with the higher power added efficiency (PAE). Further investigation show that DRBL GaN HEMT can achieve to 6.4 W/mm and the maximum PAE 83.8% at 2400 MHz. Both are higher than the 5.0 W/mm and 80.3% for the conventional structure. When the operating frequency increases to X band, the DRBL GaN HEMT still exhibits the superior output performances. All the results show that the advantages and the potential capacities of DRBL GaN HEMT at high efficiency-energy are greater than the conventional GaN HEMT.

  7. Weakly doped InP layers prepared by liquid phase epitaxy using a modulated cooling rate

    Science.gov (United States)

    Krukovskyi, R.; Mykhashchuk, Y.; Kost, Y.; Krukovskyi, S.; Saldan, I.

    2017-04-01

    Epitaxial structures based on InP are widely used to manufacture a number of devices such as microwave transistors, light-emitting diodes, lasers and Gunn diodes. However, their temporary instability caused by heterogeneity of resistivity along the layer thickness and the influence of various external or internal factors prompts the need for the development of a new reliable technology for their preparation. Weak doping by Yb, Al and Sn together with modulation of the cooling rate applied to prepare InP epitaxial layers is suggested to be adopted within the liquid phase epitaxy (LPE) method. The experimental results confirm the optimized conditions created to get a uniform electron concentration in the active n-InP layer. A sharp profile of electron concentration in the n+-InP(substrate)/n-InP/n+-InP epitaxial structure was observed experimentally at the proposed modulated cooling rate of 0.3 °С-1.5 °С min-1. The proposed technological method can be used to control the electrical and physical properties of InP epitaxial layers to be used in Gunn diodes.

  8. Stress relaxation in thick-film GaN grown by hydride vapor phase epitaxy on sapphire and spinel substrates as studied by photoluminescence and raman spectroscopy

    CERN Document Server

    Kim, S T; Lee, C; Kim, J E; Park, H Y

    1999-01-01

    The residual strains in thick-film GaN grown on both sapphire and spinel substrates has been evaluated by photoluminescence (PL) and raman spectroscopy . The strain-free shallow donor bound exciton recombination energy (I sub 2) is 3.468 eV at 10 K. The raman mode frequency shift with residual strain with estimated as DELTA w = 3.93 cm sup - sup 1 per one GPa for GaN layers on both substrates . The linear relationship between the PL I sub 2 line and the raman E sub 2 mode frequency is DELTA E/DELTA w = 5.12 meV/cm sup - sup 1 , which leads to a stress-induced PL line shift of DELTA E = 20 meV/GPa.

  9. Transmission Electron Microscopy Study of Defect Reduction in Two-Step Lateral Epitaxial Overgrown Nonplanar GaN Substrate Templates

    National Research Council Canada - National Science Library

    Zhou, Wei; Ren, Dawei; Dapkus, P. D

    2005-01-01

    ...). The LEO nonplanar GaN substrate template has a trapezoidal cross section with smooth (0 0 0 1) and f11 22g facets. We demonstrate here the dislocation distribution and behavior in both ordinary LEO and two-step LEO...

  10. Hydrothermal epitaxial growth of ZnO films on sapphire substrates presenting epitaxial ZnAl{sub 2}O{sub 4} buffer layers

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Hou-Guang, E-mail: houguang@isu.edu.tw; Wang, Chi-Wei; Tu, Zhi-Fan

    2014-03-01

    This article describes our investigation of the hydrothermal epitaxial growth of c-plane ZnO films on Al{sub 2}O{sub 3} substrates presenting ZnAl{sub 2}O{sub 4} buffer layers. We obtained (111) ZnAl{sub 2}O{sub 4} epitaxial layers on a-plane Al{sub 2}O{sub 3} substrates readily through solid phase epitaxy. Although the ZnAl{sub 2}O{sub 4} buffer layers grew epitaxially with a (111) out-of-plane orientation and comprised two coexisting equivalent azimuthal variants with relative 180° in-plane rotation, the ZnO epitaxial films grown upon them exhibited a c-plane orientation with unitary in-plane epitaxial orientation of <11{sup ¯}00>{sub ZnO}∥<11{sup ¯}0>{sub ZnAl{sub 2O{sub 4}}} on the two different ZnAl{sub 2}O{sub 4} variants. Taking the coincidence of the site lattices between the (0001) plane of ZnO and the (111) plane of ZnAl{sub 2}O{sub 4} into account, a reduction in lattice misfit was achieved through a 30° rotation between the lattices of the ZnO and the ZnAl{sub 2}O{sub 4}. We used X-ray diffraction and transmission electron microscopy to obtain detailed microstructural views of the hydrothermally grown ZnO epitaxial films on the ZnAl{sub 2}O{sub 4} buffer layers. - Highlights: • The c-plane ZnO films were epitaxially grown on Al{sub 2}O{sub 3} substrates presenting ZnAl{sub 2}O{sub 4} buffer layers. • We obtained (111) ZnAl{sub 2}O{sub 4} epitaxial layers on a-plane Al{sub 2}O{sub 3} substrates through solid phase epitaxy. • The ZnAl{sub 2}O{sub 4} layers comprised two equivalent azimuthal variants with relative 180° in-plane rotation. • The c-plane ZnO epitaxial films grown on ZnAl{sub 2}O{sub 4} layers with an in-plane relationship of <11{sup ¯}00>{sub ZnO}∥<11{sup ¯}0>{sub ZnAl{sub 2O{sub 4}}}.

  11. Insulating gallium oxide layer produced by thermal oxidation of gallium-polar GaN: Insulating gallium oxide layer produced by thermal oxidation of gallium-polar GaN

    Energy Technology Data Exchange (ETDEWEB)

    Hossain, T. [Kansas State Univ., Manhattan, KS (United States); Wei, D. [Kansas State Univ., Manhattan, KS (United States); Nepal, N. [Naval Research Lab. (NRL), Washington, DC (United States); Garces, N. Y. [Naval Research Lab. (NRL), Washington, DC (United States); Hite, J. K. [Naval Research Lab. (NRL), Washington, DC (United States); Meyer, H. M. [Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Eddy, C. R. [Naval Research Lab. (NRL), Washington, DC (United States); Baker, Troy [Nitride Solutions, Wichita, KS (United States); Mayo, Ashley [Nitride Solutions, Wichita, KS (United States); Schmitt, Jason [Nitride Solutions, Wichita, KS (United States); Edgar, J. H. [Kansas State Univ., Manhattan, KS (United States)

    2014-02-24

    We report the benefits of dry oxidation of n -GaN for the fabrication of metal-oxide-semiconductor structures. GaN thin films grown on sapphire by MOCVD were thermally oxidized for 30, 45 and 60 minutes in a pure oxygen atmosphere at 850 °C to produce thin, smooth GaOx layers. Moreover, the GaN sample oxidized for 30 minutes had the best properties. Its surface roughness (0.595 nm) as measured by atomic force microscopy (AFM) was the lowest. Capacitance-voltage measurements showed it had the best saturation in accumulation region and the sharpest transition from accumulation to depletion regions. Under gate voltage sweep, capacitance-voltage hysteresis was completely absent. The interface trap density was minimum (Dit = 2.75×1010 cm–2eV–1) for sample oxidized for 30 mins. These results demonstrate a high quality GaOx layer is beneficial for GaN MOSFETs.

  12. Transmission electron microscopy of GaN layers in-situ doped with Er during plasma assisted MBE

    Science.gov (United States)

    Wojtowicz, T.; Ruterana, P.; Lee, D. S.; Steckl, A. J.

    2005-05-01

    A TEM investigation has been carried out on a series of Er GaN layers doped in-situ plasma assisted MBE growth. In the window of 870-930 °C gallium cell temperatures, Ga droplets are formed at the highest, in that case the emission efficiency is low. However as far as the microstructure is concerned, it is not obvious that the best crystallinity layer will give the highest PL signal.

  13. Formation of HgSe thin films using electrochemical atomic Layer epitaxy

    CSIR Research Space (South Africa)

    Mathe

    2005-09-01

    Full Text Available The growth of HgSe using electrochemical atomic-layer epitaxy (EC-ALE) is reported. EC-ALE is the electrochemical analog of ALE, where electrochemical surface-limited reactions referred to as underpotential deposits, generally result...

  14. Nanopipes in GaN : Photo-etching and TEM study

    NARCIS (Netherlands)

    Lazar, S.; Weyher, J.L.; Macht, L.; Tichelaar, F.D.; Zandbergen, H.W.

    2004-01-01

    Photochemical (PEC) etching and transmission electron microscopy (TEM) have been used to study the defects in hetero-epitaxial GaN layers. TEM proved that PEC etching reveals not only dislocations but also nanopipes in the form of protruding, whisker-like etch features. It is shown by diffraction

  15. Nanopipes in GaN: photo-etching and TEM study

    NARCIS (Netherlands)

    Lazar, S.; Weyher, J.L.; Macht, L.J.; Tichelaar, F.D.; Zandbergen, H.W.

    2004-01-01

    Photochemical (PEC) etching and transmission electron microscopy (TEM) have been used to study the defects in hetero-epitaxial GaN layers. TEM proved that PEC etching reveals not only dislocations but also nanopipes in the form of protruding, whisker-like etch features. It is shown by diffraction

  16. Optical excitation and external photoluminescence quantum efficiency of Eu3+ in GaN

    NARCIS (Netherlands)

    de Boer, W.D.A.M.; McGonigle, C.; Gregorkiewicz, T.; Fujiwara, Y.; Stallinga, P.

    2014-01-01

    We investigate photoluminescence of Eu-related emission in a GaN host consisting of thin layers grown by organometallic vapor-phase epitaxy. By comparing it with a reference sample of Eu-doped Y2O3, we find that the fraction of Eu3+ ions that can emit light upon optical excitation is of the order of

  17. Impacts of oxidants in atomic layer deposition method on Al2O3/GaN interface properties

    Science.gov (United States)

    Taoka, Noriyuki; Kubo, Toshiharu; Yamada, Toshikazu; Egawa, Takashi; Shimizu, Mitsuaki

    2018-01-01

    The electrical interface properties of GaN metal–oxide–semiconductor (MOS) capacitors with an Al2O3 gate insulator formed by atomic layer deposition method using three kinds of oxidants were investigated by the capacitance–voltage technique, Terman method, and conductance method. We found that O3 and the alternate supply of H2O and O3 (AS-HO) are effective for reducing the interface trap density (D it) at the energy range of 0.15 to 0.30 eV taking from the conduction band minimum. On the other hand, we found that surface potential fluctuation (σs) induced by interface charges for the AS-HO oxidant is much larger than that for a Si MOS capacitor with a SiO2 layer formed by chemical vapor deposition despite the small D it values for the AS-HO oxidant compared with the Si MOS capacitor. This means that the total charged center density including the fixed charge density, charged slow trap density, and charged interface trap density for the GaN MOS capacitor is higher than that for the Si MOS capacitor. Therefore, σs has to be reduced to improve the performances and reliability of GaN devices with the Al2O3/GaN interfaces.

  18. Efficient Exciton Diffusion and Resonance-Energy Transfer in Multi-Layered Organic Epitaxial Nanofibers

    DEFF Research Database (Denmark)

    Tavares, Luciana; Cadelano, Michele; Quochi, Francesco

    2015-01-01

    Multi-layered epitaxial nanofibers are exemplary model systems for the study of exciton dynamics and lasing in organic materials due to their well-defined morphology, high luminescence efficiencies, and color tunability. We resort to temperature-dependent cw and picosecond photoluminescence (PL......) spectroscopy to quantify exciton diffusion and resonance-energy transfer (RET) processes in multi-layered nanofibers consisting of alternating layers of para-hexaphenyl (p6P) and α-sexithiophene (6T), serving as exciton donor and acceptor material, respectively. The high probability for RET processes...... is confirmed by Quantum Chemical calculations. The activation energy for exciton diffusion in p6P is determined to be as low as 19 meV, proving p6P epitaxial layers also as a very suitable donor material system. The small activation energy for exciton diffusion of the p6P donor material, the inferred high p6P...

  19. Structural properties and Raman modes of zinc blende InN epitaxial layers

    Science.gov (United States)

    Tabata, A.; Lima, A. P.; Teles, L. K.; Scolfaro, L. M. R.; Leite, J. R.; Lemos, V.; Schöttker, B.; Frey, T.; Schikora, D.; Lischka, K.

    1999-01-01

    We report on x-ray diffraction and micro-Raman scattering studies on zinc blende InN epitaxial films. The samples were grown by molecular beam epitaxy on GaAs(001) substrates using a InAs layer as a buffer. The transverse-optical (TO) and longitudinal-optical phonon frequencies at Γ of c-InN are determined and compared to the corresponding values for c-GaN. Ab initio self-consistent calculations are carried out for the c-InN and c-GaN lattice parameters and TO phonon frequencies. A good agreement between theory and experiment is found.

  20. Atomic layer epitaxy of hematite on indium tin oxide for application in solar energy conversion

    Science.gov (United States)

    Martinson, Alex B.; Riha, Shannon; Guo, Peijun; Emery, Jonathan D.

    2016-07-12

    A method to provide an article of manufacture of iron oxide on indium tin oxide for solar energy conversion. An atomic layer epitaxy method is used to deposit an uncommon bixbytite-phase iron (III) oxide (.beta.-Fe.sub.2O.sub.3) which is deposited at low temperatures to provide 99% phase pure .beta.-Fe.sub.2O.sub.3 thin films on indium tin oxide. Subsequent annealing produces pure .alpha.-Fe.sub.2O.sub.3 with well-defined epitaxy via a topotactic transition. These highly crystalline films in the ultra thin film limit enable high efficiency photoelectrochemical chemical water splitting.

  1. Epitaxial growth and spectroscopic investigation of BaSO4:Mn6+ layers

    NARCIS (Netherlands)

    Ehrentraut, D.; Pollnau, Markus; Kück, S.

    2002-01-01

    We report on the first layer growth of a Mn6+-doped material. Large-size BaSO4 substrates of 10×6×4 mm3 were grown from a LiCl solvent by the flux method. Flat surfaces of undoped BaSO4 were then achieved by use of liquid-phase epitaxy (LPE) from a CsCl–KCl–NaCl solvent. Finally, BaSO4:Mn6+ layers

  2. Research of acceptor impurity thermal activation in GaN: Mg epitaxial layers

    Directory of Open Access Journals (Sweden)

    Aleksandr V. Mazalov

    2016-06-01

    The effect of thermal annealing of GaN:Mg layers on acceptor impurity activation has been investigated. Hole concentration increased and mobility decreased with an increase in thermal annealing temperature. The sample annealed at 1000 °C demonstrated the lowest value of resistivity. Rapid thermal annealing (annealing with high heating speed considerably improved the efficiency of Mg activation in the GaN layers. The optimum time of annealing at 1000 °C has been determined. The hole concentration increased by up to 4 times compared to specimens after conventional annealing.

  3. Structural, optical and electrical study of undoped GaN layers obtained by metalorganic chemical vapor deposition on sapphire substrates

    Energy Technology Data Exchange (ETDEWEB)

    Rangel-Kuoppa, Victor-Tapio, E-mail: tapio.rangel@gmail.co [Institute of Semiconductor and Solid State Physics, Johannes Kepler Universitaet, A-4040 Linz (Austria); Aguilar, Cesia Guarneros [Seccion de Electronica del Estado Solido, Departamento de Ingenieria Electrica, Centro de Investigacion y de Estudios Avanzados del Instituto Politecnico Nacional, A.P. 14740, C.P. 07360, Mexico, Distrito Federal (Mexico); Sanchez-Resendiz, Victor, E-mail: victors@sees.cinvestav.m [Seccion de Electronica del Estado Solido, Departamento de Ingenieria Electrica, Centro de Investigacion y de Estudios Avanzados del Instituto Politecnico Nacional, A.P. 14740, C.P. 07360, Mexico, Distrito Federal (Mexico)

    2011-01-31

    We investigate optical, structural and electrical properties of undoped GaN grown on sapphire. The layers were prepared in a horizontal reactor by low pressure metal organic chemical vapor deposition at temperatures of 900 {sup o}C and 950 {sup o}C on a low temperature grown (520 {sup o}C) GaN buffer layer on (0001) sapphire substrate. The growth pressure was kept at 10,132 Pa. The photoluminescence study of such layers revealed a band-to-band emission around 366 nm and a yellow band around 550 nm. The yellow band intensity decreases with increasing deposition temperature. X-ray diffraction, atomic force microscopy and scanning electron microscopy studies show the formation of hexagonal GaN layers with a thickness of around 1 {mu}m. The electrical study was performed using temperature dependent Hall measurements between 35 and 373 K. Two activation energies are obtained from the temperature dependent conductivity, one smaller than 1 meV and the other one around 20 meV. For the samples grown at 900 {sup o}C the mobilities are constant around 10 and 20 cm{sup 2} V{sup -1} s{sup -1}, while for the sample grown at 950 {sup o}C the mobility shows a thermally activated behavior with an activation energy of 2.15 meV.

  4. P-type surface effects for thickness variation of 2um and 4um of n-type layer in GaN LED

    Science.gov (United States)

    Halim, N. S. A. Abdul; Wahid, M. H. A.; Hambali, N. A. M. Ahmad; Rashid, S.; Ramli, M. M.; Shahimin, M. M.

    2017-09-01

    The internal quantum efficiency of III-Nitrides group, GaN light-emitting diode (LED) has been considerably limited due to the insufficient hole injection and this is caused by the lack of performance p-type doping and low hole mobility. The low hole mobility makes the hole less energetic, thus reduced the performance operation of GaN LED itself. The internal quantum efficiency of GaN-based LED with surface roughness (texture) can be changed by texture size, density, and thickness of GaN film or by the combined effects of surface shape and thickness of GaN film. Besides, due to lack of p-type GaN, attempts to look forward the potential of GaN LED relied on the thickness of n-type layer and surface shape of p-type GaN layer. This work investigates the characteristics of GaN LED with undoped n-GaN layer of different thickness and the surface shape of p-type layer. The LEDs performance is significantly altered by modifying the thickness and shape. Enhancement of n-GaN layer has led to the annihilation of electrical conductivity of the chip. Different surface geometry governs the emission rate extensively. Internal quantum efficiency is also predominantly affected by the geometry of n-GaN layer which subjected to the current spreading. It is recorded that the IQE droop can be minimized by varying the thickness of the active layer without amplifying the forward voltage. Optimum forward voltage (I-V), total emission rate relationship with the injected current and internal quantum efficiency (IQE) for 2,4 µm on four different surfaces of p-type layer are also reported in this paper.

  5. Lateral epitaxial growth techniques for gallium nitride thin films on 6H-silicon carbide(0001) substrates via metalorganic vapor phase epitaxy

    Science.gov (United States)

    Thomson, Darren Brent

    Pendeo-epitaxy (PE) was developed as an alternative method to lateral epitaxial overgrowth (LEO) for the growth of GaN films with lower dislocation densities than that of conventionally grown films. In the PE technique, GaN is grown laterally from the sidewalls of etched stripes in previously deposited GaN seed layers grown on 6H-SiC(0001). The resulting GaN structure is suspended above the substrate and thereby avoids the formation of threading dislocations that arise from the lattice mismatch between the GAN film, buffer layer and substrate. The dislocation density in the laterally grown material is reduced by approximately five orders of magnitude. Uncoalesced and coalesced PE GaN structures have been successfully grown in this research. The growth mechanism for GaN via lateral epitaxy (LE) is described using a model of interpenetrating hexagonal pyramids. In contrast to the moderate rates of lateral growth of this compound from seed stripes oriented along [112¯0], analogous growth from stripes oriented parallel to [11¯00] can have high lateral growth rates due to the competition between adjacent (101¯1) and (011¯1) facets. When appropriate growth conditions are employed, the competing facets yield to the fast growing metastable (112¯0) vertical facet. In the absence of competing facets, which occurs at the ends of the stripes, the morphology of the lateral growth reverts to the stable {11¯01} facets. The formation of voids during the coalescence of GaN grown via lateral epitaxy is a common occurrence. These voids weaken the film and make it more susceptible to cracking. The interpenetrating hexagonal pyramid model is used to describe the growth mechanism leading to the formation of voids and their elimination. Experimental observations consistent with this model are presented. A novel method for the elimination of coalescence voids using an unconventional seed stripe orientation is also presented.

  6. Admittance spectroscopy of Mg-doped GaN grown by molecular beam epitaxy using RF nitrogen sources

    CERN Document Server

    Kim, D J; Kim, K H; Bojarczuk, N A; Karasinski, J; Guha, S; Lee, H G

    1999-01-01

    Thermal activation energies of Mg in GaN grown using RF nitrogen source with varying Mg flux were examined using an admittance spectroscopy technique. There was no noticeable difference or trend in the activation energy with varying Mg flux. The thermal activation energy for GaN:Mg was approx 115 meV under the investigated Mg flux range. Negligible persistent photo-conductivity and yellow luminescence peak in PL observed in the samples suggest possible reduction of the thermal activation energies compared to the values in the literature.

  7. Defect formation and carrier doping in epitaxial films of the infinite layer compound

    Energy Technology Data Exchange (ETDEWEB)

    Feenstra, R.; Pennycook, S.J.; Chisholm, M.F. [Oak Ridge National Lab., TN (United States). Solid State Div.] [and others

    1996-02-01

    The correlation between defect formation and carrier doping in epitaxial films of the infinite layer compound SrCuO{sub 2} has been studied via molecular beam epitaxy controlled layer-by-layer growth experiments, chemically resolved scanning transmission electron microscopy, scanning tunneling microscopy, x-ray diffraction, electrical transport measurements, and post-growth oxidation-reduction annealing. Based on the complementary information provided by these experiments, it is concluded that the carrier doping is dominated by the formation of an electron-doped, Sr and O deficient matrix under mildly oxidizing growth conditions. Hole-doping is induced by extended defects containing excess Sr atoms and may lead to superconductivity after high-temperature oxidation.

  8. Epitaxial Growth of Hard Ferrimagnetic Mn3Ge Film on Rhodium Buffer Layer

    Directory of Open Access Journals (Sweden)

    Atsushi Sugihara

    2015-06-01

    Full Text Available Mn\\(_3\\Ge has a tetragonal Heusler-like D0\\(_{22}\\ crystal structure, exhibiting a large uniaxial magnetic anisotropy and small saturation magnetization due to its ferrimagnetic spin structure; thus, it is a hard ferrimagnet. In this report, epitaxial growth of a Mn\\(_3\\Ge film on a Rh buffer layer was investigated for comparison with that of a film on a Cr buffer layer in terms of the lattice mismatch between Mn\\(_3\\Ge and the buffer layer. The film grown on Rh had much better crystalline quality than that grown on Cr, which can be attributed to the small lattice mismatch. Epitaxial films of Mn\\(_3\\Ge on Rh show somewhat small coercivity (\\(H_{\\rm c}\\ = 12.6 kOe and a large perpendicular magnetic anisotropy (\\(K_{\\rm u}\\ = 11.6 Merg/cm\\(^3\\, comparable to that of the film grown on Cr.

  9. Sidewall GaAs tunnel junctions fabricated using molecular layer epitaxy

    Directory of Open Access Journals (Sweden)

    Takeo Ohno and Yutaka Oyama

    2012-01-01

    Full Text Available In this article we review the fundamental properties and applications of sidewall GaAs tunnel junctions. Heavily impurity-doped GaAs epitaxial layers were prepared using molecular layer epitaxy (MLE, in which intermittent injections of precursors in ultrahigh vacuum were applied, and sidewall tunnel junctions were fabricated using a combination of device mesa wet etching of the GaAs MLE layer and low-temperature area-selective regrowth. The fabricated tunnel junctions on the GaAs sidewall with normal mesa orientation showed a record peak current density of 35 000 A cm-2. They can potentially be used as terahertz devices such as a tunnel injection transit time effect diode or an ideal static induction transistor.

  10. The interplay of blocking properties with charge and potential redistribution in thin carbon-doped GaN on n-doped GaN layers

    Science.gov (United States)

    Koller, Christian; Pobegen, Gregor; Ostermaier, Clemens; Huber, Martin; Pogany, Dionyz

    2017-07-01

    In carbon-doped GaN (GaN:C) buffers used in a GaN-on-Si technology, the buffer is embedded in between transition and channel layers. This makes the analysis of buffer properties difficult due to e.g., carrier injection from or potential drop at these adjacent layers. Here, we analyze capacitance- and current-voltage characteristics of 200-300 nm thick GaN:C ([C] = 1019 cm-3) layers which are embedded between a top metal electrode and bottom n-doped GaN (n-GaN). Such structures allow a better potential control in GaN:C and thus determination of the band diagram quantitatively. The accumulation of negative charge (concentration up to 6 × 1017 cm-3) with bias is observed in GaN:C at both polarities. For biases Vappl GaN:C near to its interface with n-GaN so that GaN:C exhibits no potential drop and blocks leakage current. For Vappl > +1.7 V, accumulated negative charges in GaN:C raise an energy barrier of ˜1.1 eV for electron injection from n-GaN to GaN:C. This causes a potential drop in GaN:C leading to a significant leakage current increase. The Fermi level pinning in GaN:C at a commonly referred acceptor at EV + 0.7(±0.2) eV is extracted only from electrostatic considerations. The occupancy change of carbon acceptors is attributed to trapping processes where the dislocation-related conductive paths are supposed to be involved in carrier transport from the top metal electrode to the carbon defect.

  11. Growth mechanisms for Si epitaxy on O atomic layers: Impact of O-content and surface structure

    Energy Technology Data Exchange (ETDEWEB)

    Jayachandran, Suseendran, E-mail: suseendran.jayachandran@imec.be [Imec, Kapeldreef 75, 3001 Leuven (Belgium); KU Leuven (University of Leuven), Department of Metallurgy and Materials, Castle Arenberg 44, B-3001 Leuven (Belgium); Billen, Arne [Imec, Kapeldreef 75, 3001 Leuven (Belgium); KU Leuven (University of Leuven), Department of Chemistry, Celestijnenlaan 200F, B-3001 Leuven (Belgium); Douhard, Bastien; Conard, Thierry; Meersschaut, Johan; Moussa, Alain; Caymax, Matty; Bender, Hugo [Imec, Kapeldreef 75, 3001 Leuven (Belgium); Vandervorst, Wilfried [Imec, Kapeldreef 75, 3001 Leuven (Belgium); KU Leuven (University of Leuven), Department of Physics and Astronomy, Celestijnenlaan 200D, B-3001 Leuven (Belgium); Heyns, Marc [Imec, Kapeldreef 75, 3001 Leuven (Belgium); KU Leuven (University of Leuven), Department of Metallurgy and Materials, Castle Arenberg 44, B-3001 Leuven (Belgium); Delabie, Annelies [Imec, Kapeldreef 75, 3001 Leuven (Belgium); KU Leuven (University of Leuven), Department of Chemistry, Celestijnenlaan 200F, B-3001 Leuven (Belgium)

    2016-10-30

    Highlights: • O{sub 3} or O{sub 2} exposures on H-Si(100) result in O ALs with different surface structures. • Si-EPI on O AL using O{sub 3} process is by direct epitaxial growth mechanism. • Si-EPI on O AL using O{sub 2} process is by epitaxial lateral overgrowth mechanism. • Distortions by O AL, SiH{sub 4} flux rate and Si thickness has an impact on Si-EPI quality. - Abstract: The epitaxial growth of Si layers on Si substrates in the presence of O atoms is generally considered a challenge, as O atoms degrade the epitaxial quality by generating defects. Here, we investigate the growth mechanisms for Si epitaxy on O atomic layers (ALs) with different O-contents and structures. O ALs are deposited by ozone (O{sub 3}) or oxygen (O{sub 2}) exposure on H-terminated Si at 50 °C and 300 °C respectively. Epitaxial Si is deposited by chemical vapor deposition using silane (SiH{sub 4}) at 500 °C. After O{sub 3} exposure, the O atoms are uniformly distributed in Si-Si dimer/back bonds. This O layer still allows epitaxial seeding of Si. The epitaxial quality is enhanced by lowering the surface distortions due to O atoms and by decreasing the arrival rate of SiH{sub 4} reactants, allowing more time for surface diffusion. After O{sub 2} exposure, the O atoms are present in the form of SiO{sub x} clusters. Regions of hydrogen-terminated Si remain present between the SiO{sub x} clusters. The epitaxial seeding of Si in these structures is realized on H-Si regions, and an epitaxial layer grows by a lateral overgrowth mechanism. A breakdown in the epitaxial ordering occurs at a critical Si thickness, presumably by accumulation of surface roughness.

  12. Impact of N-plasma and Ga-irradiation on MoS2 layer in molecular beam epitaxy

    KAUST Repository

    Mishra, Pawan

    2017-01-03

    Recent interest in two-dimensional materials has resulted in ultra-thin devices based on the transfer of transition metal dichalcogenides (TMDs) onto other TMDs or III-nitride materials. In this investigation, we realized p-type monolayer (ML) MoS2, and intrinsic GaN/p-type MoS2 heterojunction by the GaN overgrowth on ML-MoS2/c-sapphire using the plasma-assisted molecular beam epitaxy. A systematic nitrogen plasma (N∗2N2*) and gallium (Ga) irradiation studies are employed to understand the individual effect on the doping levels of ML-MoS2, which is evaluated by micro-Raman and high-resolution X-Ray photoelectron spectroscopy (HRXPS) measurements. With both methods, p-type doping was attained and was verified by softening and strengthening of characteristics phonon modes E12gE2g1 and A1gA1g from Raman spectroscopy. With adequate N∗2N2*-irradiation (3 min), respective shift of 1.79 cm−1 for A1gA1g and 1.11 cm−1 for E12gE2g1 are obtained while short term Ga-irradiated (30 s) exhibits the shift of 1.51 cm−1 for A1gA1g and 0.93 cm−1 for E12gE2g1. Moreover, in HRXPS valence band spectra analysis, the position of valence band maximum measured with respect to the Fermi level is determined to evaluate the type of doping levels in ML-MoS2. The observed values of valance band maximum are reduced to 0.5, and 0.2 eV from the intrinsic value of ≈1.0 eV for N∗2N2*- and Ga-irradiated MoS2 layers, which confirms the p-type doping of ML-MoS2. Further p-type doping is verified by Hall effect measurements. Thus, by GaN overgrowth, we attained the building block of intrinsic GaN/p-type MoS2 heterojunction. Through this work, we have provided the platform for the realization of dissimilar heterostructure via monolithic approach.

  13. Study of recombination characteristics in MOCVD grown GaN epi-layers on Si

    Science.gov (United States)

    Gaubas, E.; Ceponis, T.; Dobrovolskas, D.; Malinauskas, T.; Meskauskaite, D.; Miasojedovas, S.; Mickevicius, J.; Pavlov, J.; Rumbauskas, V.; Simoen, E.; Zhao, M.

    2017-12-01

    The radiative and non-radiative recombination carrier decay lifetimes in GaN epi-layers grown by metal-organic chemical vapour deposition technology on Si substrates were measured by contactless techniques of time-resolved photoluminescence and microwave-probed transients of photoconductivity. The lifetime variations were obtained to be dependent on growth regimes. These variations have been related to varied densities of edge dislocations associated with growth temperature. It has been also revealed that the lateral carrier lifetime and photoluminescence intensity distribution is determined by the formation of dislocation clusters dependent on the growth conditions. For low excitation level, the asymptotic component within the excess carrier decay transients is attributed to carrier trapping and anomalous diffusion through random-walk processes within dislocation cluster regions and barriers at dislocation cores. The two-componential decay process at high excitation conditions, where excess carriers may suppress barriers, proceeds through a nonlinear recombination, where band-to-band transitions determine the nonlinearity of the process, while the asymptotic component is ascribed to the impact of D-A pair PL within the long-wavelength wing of the UV-PL band.

  14. Molecular beam epitaxial growth of layered Bi-Sr-Ca-Cu-O compounds

    Science.gov (United States)

    Schlom, D. G.; Marshall, A. F.; Sizemore, J. T.; Chen, Z. J.; Eckstein, J. N.

    1990-05-01

    The in situ epitaxial growth of Bi-Sr-Ca-Cu-O films by molecular beam epitaxy (MBE) is reported. The suitability of various oxidants for the MBE growth of cuprate superconductors is discussed, and the use of ozone described. Molecular beams of the constituents were periodically shuttered to grow various Bi2Sr2Ca(n-1)Cu(n)O(x) phases, including 2201, 2212, 2223, 2245, and layered 2212/2223 and 2223/2234 mixtures. Some of the films grown in this way were superconducting as grown. The ability of MBE to grow layered, probably metastable Bi2Sr2Ca(n-1)Cu(n)O(x) films is demonstrated.

  15. Etching and ellipsometry studies on CL-VPE grown GaN epilayer

    Directory of Open Access Journals (Sweden)

    Puviarasu P.

    2017-02-01

    Full Text Available The surface morphological characteristics of wet chemical etched GaN layers grown at different temperatures on (0 0 0 1 sapphire substrates by Chloride-Vapor Phase Epitaxy (Cl-VPE have been studied using optical microscope. Significant surface morphology changes have been observed in correlation to the growth temperature and etching time. Also optical properties of the as grown and high-energy silicon (Si ion irradiated gallium nitride (GaN epilayers were studied using monochromatic ellipsometry. The effect of ion fluences on the refractive index of the GaN has been investigated and it has been found to decrease with an increase of ion fluence. This decrease is attributed to irradiation-induced defects and polycrystallization which plays an important role in determining the optical properties of silicon (Si ion irradiated GaN layers.

  16. An accurate method to determine the growth conditions during molecular beam epitaxy of cubic GaN

    Energy Technology Data Exchange (ETDEWEB)

    Schoettker, B.; Kuehler, J.; As, D.J.; Schikora, D.; Lischka, K. [Paderborn Univ. (Gesamthochschule) (Germany). Fachbereich 6 - Physik

    1998-08-01

    Reflection high energy electron diffraction (RHEED) is used to study the reconstruction of the (001) surface of cubic GaN, in particular to monitor the c(2 x 2) to (2 x 2) transition when the substrate shutter is closed. The delay time of the RHEED intensity increase after closing the substrate shutter is used as a measure of the excess Ga accumulated during growth at the surface. We describe a method which allows by measuring the transient of the intensity of the half-order streak to obtain optimum conditions for the growth of homogeneous c-GaN epilayers with a minimum density of micron-sized crystalline inclusions. (orig.) 7 refs.

  17. Step-free GaN surfaces grown by confined-area metal-organic vapor phase epitaxy

    Science.gov (United States)

    Shelton, Christopher T.; Bryan, Isaac; Paisley, Elizabeth A.; Sachet, Edward; Ihlefeld, Jon F.; Lavrik, Nick; Collazo, Ramón; Sitar, Zlatko; Maria, Jon-Paul

    2017-09-01

    A two-step homoepitaxial growth process producing step-free surfaces on low dislocation density, Ga-polar ammonothermal GaN single crystals is described. Growth is conducted under very low supersaturation conditions where adatom incorporation occurs predominantly at step edges, and lateral growth is strongly preferred. The achievable step-free area is limited by the substrate dislocation density. For ammonothermal crystals with an average dislocation density of ˜1 × 104 cm-2, step-free mesas up to 200 × 200 μm2 in size are achieved. These remarkable surfaces create a unique opportunity to study the effect of steps on the properties and performance of semiconductor heterostructures.

  18. Step-free GaN surfaces grown by confined-area metal-organic vapor phase epitaxy

    Directory of Open Access Journals (Sweden)

    Christopher T. Shelton

    2017-09-01

    Full Text Available A two-step homoepitaxial growth process producing step-free surfaces on low dislocation density, Ga-polar ammonothermal GaN single crystals is described. Growth is conducted under very low supersaturation conditions where adatom incorporation occurs predominantly at step edges, and lateral growth is strongly preferred. The achievable step-free area is limited by the substrate dislocation density. For ammonothermal crystals with an average dislocation density of ∼1 × 104 cm−2, step-free mesas up to 200 × 200 μm2 in size are achieved. These remarkable surfaces create a unique opportunity to study the effect of steps on the properties and performance of semiconductor heterostructures.

  19. Defect analysis of NiMnSb epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Nowicki, L. [Andrzej SoItan Institute for Nuclear Studies, ul. Hoza 69, 00-681 Warsaw (Poland)]. E-mail: lech.nowicki@fuw.edu.pl; Turos, A. [Andrzej SoItan Institute for Nuclear Studies, ul. Hoza 69, 00-681 Warsaw (Poland); Institute of Electronic Materials Technology, Wolczynska 133, 01-919 Warsaw (Poland); Stonert, A. [Andrzej SoItan Institute for Nuclear Studies, ul. Hoza 69, 00-681 Warsaw (Poland); Garrido, F. [Centre de Spectrometrie Nucleaire et Spectrometrie de Masse, CNRS-IN2P3-Universite Paris-Sud, 91405 Orsay (France); Molenkamp, L.W. [Department of Physics, University Wuerzburg, Am Hubland, 97074 Wuerzburg (Germany); Bach, P. [Department of Physics, University Wuerzburg, Am Hubland, 97074 Wuerzburg (Germany); Schmidt, G. [Department of Physics, University Wuerzburg, Am Hubland, 97074 Wuerzburg (Germany); Karczewski, G. [Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, 02-668 Warsaw (Poland); Muecklich, A. [Forschungszentrum Rossendorf, Institut fuer Ionenstrahlphysik und Materialforschung, POB 510119, 01314 Dresden (Germany)

    2005-10-15

    NiMnSb layers grown on InP substrates with InGaAs buffer were studied by the backscattering/channeling spectrometry (RBS/C) with He beams. The nature of predominant defects observed in the layers was studied by determination of incident-energy dependence of the relative channeling yield. The defects are described as a combination of large amount of interstitial atoms and of stacking faults or grain boundaries. The presence of grains was confirmed by transmission electron microscopy.

  20. Growth and stacking fault reduction in semi-polar GaN films on planar Si(112) and Si(113)

    Energy Technology Data Exchange (ETDEWEB)

    Ravash, Roghaiyeh; Veit, Peter; Mueller, Mathias; Schmidt, Gordon; Dempewolf, Anja; Hempel, Thomas; Blaesing, Juergen; Bertram, Frank; Dadgar, Armin; Christen, Juergen; Krost, Alois [Otto-von-Guericke-Universitaet Magdeburg, Institut fuer Experimentelle Physik, Fakultaet fuer Naturwissenschaften, Universitaetsplatz 2, 39106 Magdeburg (Germany)

    2012-03-15

    We report on metal organic vapor phase epitaxy of semi-polar growth of nearly (1 anti 106) oriented GaN films on Si(112) and (1 anti 105) and (1 anti 104) GaN on Si(113). We analyze the GaN crystallites by field emission-scanning electron microscopy (FE-SEM), scanning transmission electron microscopy (STEM), photoluminescence (PL), and cathodoluminescence (CL). A correlation between optical properties and microstructure is presented. Our studies reveal a significant reduction of basal plane stacking faults (BSFs) in semi-polar GaN grown on planar Si(112) by applying a low temperature (LT) AlN interlayer. We find that the insertion of the LT-AlN interlayer can eliminate the stacking faults in the upper GaN layer, when the LT-AlN interlayer is inserted on a smooth GaN buffer. The LT-AlN interlayer results in lattice relaxation due to misfit dislocation formation at the GaN/LT-AlN interface. In comparison, GaN grown on Si(113) with same growth conditions and a rough GaN surface does not show any BSF reduction while it is reduced for a smooth GaN layer (copyright 2012 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  1. Growth of high-quality cubic GaN on Si (0 0 1) coated with ultra-thin flat SiC by plasma-assisted molecular-beam epitaxy

    Science.gov (United States)

    Wang, D.; Hiroyama, Y.; Tamura, M.; Ichikawa, M.; Yoshida, S.

    2000-06-01

    Cubic GaN films were grown on Si (0 0 1) coated with an ultra-thin flat SiC buffer layer under both Ga-rich and N-rich conditions. The SiC buffer layer (thickness of about 2.5 nm) was grown by carbonization of Si (0 0 1) substrates in C 2H 2 (pressure of 5×10 -6 Torr) at 970°C. The GaN films prepared under the Ga-rich condition had a local atomically smooth surface. High-resolution transmission electron microscopy (TEM) showed that the main defects in the GaN films are stacking faults along the [ 1 1¯ 1> ] and [ 1 1¯ 1> 1 ] directions. Plan-view TEM showed that the dislocation density within grains was much lower than the overall dislocation density in the GaN films. The dislocation density within grains was about 4×10 5 cm -2. X-ray diffraction (XRD) and TEM showed that the GaN films had a mosaic structure. The full-width at half-maximum of the (0 0 2) XRD peak of a 0.82-μm-thick film was 19 min, one of the lowest values reported so far for cubic GaN films. And the GaN films prepared under both Ga-rich and N-rich conditions showed a strong near-band-edge photoluminescence. Yellow-band luminescence and donor-acceptor recombination peaks were also detected when the GaN films contained more extended defects and/or native-point defects.

  2. Pump-probe surface photovoltage spectroscopy measurements on semiconductor epitaxial layers

    Science.gov (United States)

    Jana, Dipankar; Porwal, S.; Sharma, T. K.; Kumar, Shailendra; Oak, S. M.

    2014-04-01

    Pump-probe Surface Photovoltage Spectroscopy (SPS) measurements are performed on semiconductor epitaxial layers. Here, an additional sub-bandgap cw pump laser beam is used in a conventional chopped light geometry SPS setup under the pump-probe configuration. The main role of pump laser beam is to saturate the sub-bandgap localized states whose contribution otherwise swamp the information related to the bandgap of material. It also affects the magnitude of Dember voltage in case of semi-insulating (SI) semiconductor substrates. Pump-probe SPS technique enables an accurate determination of the bandgap of semiconductor epitaxial layers even under the strong influence of localized sub-bandgap states. The pump beam is found to be very effective in suppressing the effect of surface/interface and bulk trap states. The overall magnitude of SPV signal is decided by the dependence of charge separation mechanisms on the intensity of the pump beam. On the contrary, an above bandgap cw pump laser can be used to distinguish the signatures of sub-bandgap states by suppressing the band edge related feature. Usefulness of the pump-probe SPS technique is established by unambiguously determining the bandgap of p-GaAs epitaxial layers grown on SI-GaAs substrates, SI-InP wafers, and p-GaN epilayers grown on Sapphire substrates.

  3. Transmission electron microscopy of GaN layers in-situ doped with Er during plasma assisted MBE

    Energy Technology Data Exchange (ETDEWEB)

    Wojtowicz, T.; Ruterana, P. [SIFCOM, UMR 6176, CNRS-ENSICAEN, 6, Bld Marechal Juin, 14050 Caen (France); Lee, D.S.; Steckl, A.J. [Nanoelectronics Laboratory, University of Cincinnati, Cincinnati, Ohio 45221-0030 (United States)

    2005-05-01

    A TEM investigation has been carried out on a series of Er GaN layers doped in-situ plasma assisted MBE growth. In the window of 870-930 C gallium cell temperatures, Ga droplets are formed at the highest, in that case the emission efficiency is low. However as far as the microstructure is concerned, it is not obvious that the best crystallinity layer will give the highest PL signal. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  4. Growth of high purity semiconductor epitaxial layers by liquid phase ...

    Indian Academy of Sciences (India)

    Unknown

    at 780°C for 20 h under Pd-diffused hydrogen obtained from a hydrogen gas generator. Growth was done on semi-insulating or n+ GaAs substrates, oriented along the. direction, which were degreased and etched in. 5 H2SO4 + 1 H2O2 + 1 H2O solution, followed by mild etch in 1% Br2 in methanol. Layers up to 8 ...

  5. Hopping conduction in GaAs layers grown by molecular-beam epitaxy at low temperatures

    OpenAIRE

    Shimogishi, F.; Mukai, K; Fukushima, S; Otsuka, N.

    2002-01-01

    The electrical conductivity of GaAs layers grown by molecular-beam epitaxy at low temperatures was studied by using the van der Pauw method. The electrical conductivity of thick GaAs layers grown at temperatures above 200 °C changes with the concentration of antisite As atoms following the nearest-neighbor hopping model. From the dependence of the conductivity on the average spacing of antisite As atoms, the Bohr radius of the donor wave function in the hydrogen like model was estimated to be...

  6. Laser MBE-grown CoFeB epitaxial layers on MgO: Surface morphology, crystal structure, and magnetic properties

    Science.gov (United States)

    Kaveev, Andrey K.; Bursian, Viktor E.; Krichevtsov, Boris B.; Mashkov, Konstantin V.; Suturin, Sergey M.; Volkov, Mikhail P.; Tabuchi, Masao; Sokolov, Nikolai S.

    2018-01-01

    Epitaxial layers of CoFeB were grown on MgO by means of laser molecular beam epitaxy using C o40F e40B20 target. The growth was combined with in situ structural characterization by three-dimensional reciprocal space mapping obtained from reflection high energy electron diffraction (RHEED) data. High-temperature single stage growth regime was adopted to fabricate CoFeB layers. As confirmed by the atomic force microscopy, the surface of CoFeB layers consists of closely spaced nanometer sized islands with dimensions dependent on the growth temperature. As shown by RHEED and XRD analysis, the CoFeB layers grown at high-temperature on MgO(001) possess body centered cubic (bcc) crystal structure with the lattice constant a =2.87 Å close to that of the C o75F e25 alloy. It was further shown that following the same high-temperature growth technique the MgO/CoFeB/MgO(001) heterostructures can be fabricated with top and bottom MgO layers of the same crystallographic orientation. The CoFeB layers were also grown on the GaN(0001) substrates using MgO(111) as a buffer layer. In this case, the CoFeB layers crystallize in bcc crystal structure with the (111) axis perpendicular to the substrate surface. The magnetic properties of the CoFeB/MgO (001) heterostructures have been investigated by measuring magnetization curves with a vibrating sample magnetometer as well as by performing magneto-optical Kerr effect (MOKE) and ferromagnetic resonance (FMR) studies. FMR spectra were obtained for the variety of the magnetic field directions and typically consisted of a single relatively narrow resonance line. The magnetization orientations and the resonance conditions were calculated in the framework of a standard magnetic energy minimization procedure involving a single K1 c cubic term for the magnetocrystalline anisotropy. This allows a fairly accurate description of the angular dependences of the resonance fields—both in-plane and out-of-plane. It was shown that CoFeB layers exhibit

  7. Conventional and pendeo-epitaxial growth of III-nitride thin films by molecular beam and metalorganic vapor phase techniques

    Science.gov (United States)

    Linthicum, Kevin James

    Reactive gas-source molecular beam epitaxy was employed for the growth of monocrystalline GaN(0001) thin films. On-surface cracking of ammonia at 800°C was the method of choice for obtaining reactive nitrogen-containing species and growth rates of 2500A/hr were achieved. Pendeo-epitaxy, a general form of selective lateral growth, was developed for the organometallic vapor phase epitaxy growth of GaN and AlGaN thin films on GaN/AlN/6H-SiC(0001) substrates. In this technique, selective lateral growth was forced to initiate from the (1120) sidewalls of etched GaN seed forms by incorporating a silicon nitride seed mask atop the forms and employing the SiC substrate as a pseudo-mask. Coalescence over and between the seed forms was achieved. Transmission electron microscopy revealed that all vertically threading defects stemming from the GaN/AlN and AlN/SiC interfaces were contained within the seed forms and that a substantial reduction in the dislocation density of the laterally grown GaN was achieved. To achieve pendeo-epitaxial growth of monocrystalline GaN films on Si(111) substrates, a series of additional process steps was required, including the formation of a SiC chemical/reaction barrier. Single-crystal beta-SiC(111) thin films were obtained via carburization of the near-surface regions of vicinal Si(111). The thickness of the converted layers was approximately 5nm. Thick (500nm), epitaxial 3C-SiC layers grown via atmospheric pressure chemical vapor deposition were also used in tandem with the carburized silicon substrates. Monocrystalline AlN(0001) layers were grown on the SiC/Si substrates at 1100°C via MOVPE. Single-crystal wurtzitic GaN(0001) seed layers were grown on the AlN(0001) layers. The FWHM of the GaN(0002) x-ray diffraction and the photoluminescence band-edge emission peaks were 1443 arcsec and 19 meV, respectively. Pendeo-epitaxial growth of GaN on GaN/AlN/3C-SiC/Si(111) raised stripes was achieved. Crystallographic tilting of 0.2°(720 arcsec

  8. Photoelectrochemistry of III-V epitaxial layers and nanowires for solar energy conversion

    Science.gov (United States)

    Parameshwaran, Vijay; Enck, Ryan; Chung, Roy; Kelley, Stephen; Sampath, Anand; Reed, Meredith; Xu, Xiaoqing; Clemens, Bruce

    2017-05-01

    III-V materials, which exhibit high absorption coefficients and charge carrier mobility, are ideal templates for solar energy conversion applications. This work describes the photoelectrochemistry research in several IIIV/electrolyte junctions as an enabler for device design for solar chemical reactions. By designing lattice-matched epitaxial growth of InGaP and GaP on GaAs and Si, respectively, extended depletion region electrodes achieve photovoltages which provide an additional boost to the underlying substrate photovoltage. The InGaP/GaAs and GaP/Si electrodes drive hydrogen evolution currents under aqueous conditions. By using nanowires of InN and InP under carefully controlled growth conditions, current and capacitance measurements are obtained to reveal the nature of the nanowire-electrolyte interface and how light is translated into photocurrent for InP and a photovoltage in InN. The materials system is expanded into the III-V nitride semiconductors, in which it is shown that varying the morphology of GaN on silicon yields insights to how the interface and light conversion is modulated as a basis for future designs. Current extensions of this work address growth and tuning of the III-V nitride electrodes with doping and polarization engineering for efficient coupling to solar-driven chemical reactions, and rapid-throughput methods for III-V nanomaterials synthesis in this materials space.

  9. Viability and proliferation of endothelial cells upon exposure to GaN nanoparticles

    Directory of Open Access Journals (Sweden)

    Tudor Braniste

    2016-09-01

    Full Text Available Nanotechnology is a rapidly growing and promising field of interest in medicine; however, nanoparticle–cell interactions are not yet fully understood. The goal of this work was to examine the interaction between endothelial cells and gallium nitride (GaN semiconductor nanoparticles. Cellular viability, adhesion, proliferation, and uptake of nanoparticles by endothelial cells were investigated. The effect of free GaN nanoparticles versus the effect of growing endothelial cells on GaN functionalized surfaces was examined. To functionalize surfaces with GaN, GaN nanoparticles were synthesized on a sacrificial layer of zinc oxide (ZnO nanoparticles using hydride vapor phase epitaxy. The uptake of GaN nanoparticles by porcine endothelial cells was strongly dependent upon whether they were fixed to the substrate surface or free floating in the medium. The endothelial cells grown on surfaces functionalized with GaN nanoparticles demonstrated excellent adhesion and proliferation, suggesting good biocompatibility of the nanostructured GaN.

  10. Optical and structural characteristics of high indium content InGaN/GaN multi-quantum wells with varying GaN cap layer thickness

    Energy Technology Data Exchange (ETDEWEB)

    Yang, J.; Zhao, D. G., E-mail: dgzhao@red.semi.ac.cn; Jiang, D. S.; Chen, P.; Zhu, J. J.; Liu, Z. S.; Le, L. C.; Li, X. J.; He, X. G. [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China); Liu, J. P. [Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123 (China); Yang, H. [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China); Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123 (China); Zhang, Y. T.; Du, G. T. [State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130023 (China)

    2015-02-07

    The optical and structural properties of InGaN/GaN multi-quantum wells (MQWs) with different thicknesses of low temperature grown GaN cap layers are investigated. It is found that the MQW emission energy red-shifts and the peak intensity decreases with increasing GaN cap layer thickness, which may be partly caused by increased floating indium atoms accumulated at quantum well (QW) surface. They will result in the increased interface roughness, higher defect density, and even lead to a thermal degradation of QW layers. An extra growth interruption introduced before the growth of GaN cap layer can help with evaporating the floating indium atoms, and therefore is an effective method to improve the optical properties of high indium content InGaN/GaN MQWs.

  11. Design of Strain-Compensated Epitaxial Layers Using an Electrical Circuit Model

    Science.gov (United States)

    Kujofsa, Tedi; Ayers, John E.

    2017-12-01

    The design of heterostructures that exhibit desired strain characteristics is critical for the realization of semiconductor devices with improved performance and reliability. The control of strain and dislocation dynamics requires an understanding of the relaxation processes associated with mismatched epitaxy, and the starting point for this analysis is the equilibrium strain profile, because the difference between the actual strain and the equilibrium value determines the driving force for dislocation glide and relaxation. Previously, we developed an electrical circuit model approach for the equilibrium analysis of semiconductor heterostructures, in which an epitaxial layer may be represented by a stack of subcircuits, each of which involves an independent current source, a resistor, an independent voltage source, and an ideal diode. In this work, we have applied the electrical circuit model to study the strain compensation mechanism and show that, for a given compositionally uniform device layer with fixed mismatch and layer thickness, a buffer layer may be designed (in terms of thickness and mismatch) to tailor the strain in the device layer. A special case is that in which the device layer will exhibit zero residual strain in equilibrium (complete strain compensation). In addition, the application of the electrical circuit analogy enables the determination of exact expressions for the residual strain characteristics of both the buffer and device layers in the general case where the device layer may exhibit partial strain compensation. On the basis of this framework, it is possible to develop design equations for the tailoring of the strain in a device layer grown on a uniform composition buffer.

  12. MOCVD growth of N-polar GaN on on-axis sapphire substrate: Impact of AlN nucleation layer on GaN surface hillock density

    Science.gov (United States)

    Marini, Jonathan; Leathersich, Jeffrey; Mahaboob, Isra; Bulmer, John; Newman, Neil; (Shadi) Shahedipour-Sandvik, F.

    2016-05-01

    We report on the impact of growth conditions on surface hillock density of N-polar GaN grown on nominally on-axis (0001) sapphire substrate by metal organic chemical vapor deposition (MOCVD). Large reduction in hillock density was achieved by implementation of an optimized high temperature AlN nucleation layer and use of indium surfactant in GaN overgrowth. A reduction by more than a factor of five in hillock density from 1000 to 170 hillocks/cm-2 was achieved as a result. Crystal quality and surface morphology of the resultant GaN films were characterized by high resolution x-ray diffraction and atomic force microscopy and found to be relatively unaffected by the buffer conditions. It is also shown that the density of smaller surface features is unaffected by AlN buffer conditions.

  13. Reduction in the crystal defect density of Zn Se layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Lopez L, M.; Perez C, A.; Luyo A, J.; Melendez L, M.; Tamura, M. [Departamento de Fisica, Centro de Investigacion y de Estudios Avanzados del instituto politecnico Nacional, A.P. 14-740, 07000 Mexico D.F. (Mexico); Mendez G, V.H.; Vidal, M.A. [Instituto de Investigacion en Comunicacion Optica, Universidad Autonoma de San Luis Potosi, Alvaro Obregon 64, 78000 San Luis Potosi (Mexico)

    2000-07-01

    We present a study of the molecular beam epitaxial (MBE) grown of Zn Se layers on Ga-As and Si substrates. For the growth on GaAs substrates we investigated the effects of introducing buffer layers of Al{sub x}Ga{sub 1-x} As and In{sub x}Ga{sub 1-x} As with x = 0.01. Moreover, an analysis by secondary ion mass spectroscopy revealed that the use of AlGaAs buffer layers effectively suppress the Ga segregation onto the Zn Se layers surface. On the other hand, for the growth of Zn Se on Si substrates, we achieved a significant improvement in the crystal quality of Zn Se by irradiating the Si substrates with plasma of nitrogen prior to the growth. (Author)

  14. A study of the effect of surface pretreatment on atomic layer deposited Al2O3 interface with GaN

    Science.gov (United States)

    Gao, Jianyi; Li, Wenwen; Mandal, Saptarshi; Chowdhury, Srabanti

    2017-08-01

    Al2O3 has been an attractive gate dielectric for GaN power devices owing to its large conduction band offset with GaN ( 2.13eV), relatively high dielectric constant ( 9.0) and high breakdown electric field ( 10 MV/cm). Due to exceptional control over film uniformity and deposition rate, atomic layer deposition (ALD) has been widely used for Al2O3 deposition. The major obstacle to ALD Al2O3 on GaN is its high interface-state density (Dit) caused by incomplete chemical bonds, native oxide layer and impurities at the Al2O3/GaN interface. Therefore, an appropriate surface pretreatment prior to deposition is essential for obtaining high-quality interface. In this study, we investigated the effect of TMA, H2O and Ar/N2 plasma pretreatment on Dit and border traps (Nbt). 5 cycles of TMA purge, 5 cycles of H2O purge and Ar/N2 plasma pretreatment were conducted on GaN prior to deposition of ALD Al2O3. Al2O3/GaN metaloxide-semiconductor capacitors (MOSCAPs) were fabricated for the characterization of Dit and Nbt using UV-assisted capacitance-voltage (C-V) technique. The results show that TMA and H2O pretreatment had trivial effects on interface engineering whereas Ar/N2 plasma pretreatment slightly reduced Dit and significantly reduced Nbt.

  15. Low temperature p-type doping of (Al)GaN layers using ammonia molecular beam epitaxy for InGaN laser diodes

    Energy Technology Data Exchange (ETDEWEB)

    Malinverni, M., E-mail: marco.malinverni@epfl.ch; Lamy, J.-M.; Martin, D.; Grandjean, N. [ICMP, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne (Switzerland); Feltin, E.; Dorsaz, J. [NOVAGAN AG, CH-1015 Lausanne (Switzerland); Castiglia, A.; Rossetti, M.; Duelk, M.; Vélez, C. [EXALOS AG, CH-8952 Schlieren (Switzerland)

    2014-12-15

    We demonstrate state-of-the-art p-type (Al)GaN layers deposited at low temperature (740 °C) by ammonia molecular beam epitaxy (NH{sub 3}-MBE) to be used as top cladding of laser diodes (LDs) with the aim of further reducing the thermal budget on the InGaN quantum well active region. Typical p-type GaN resistivities and contact resistances are 0.4 Ω cm and 5 × 10{sup −4} Ω cm{sup 2}, respectively. As a test bed, we fabricated a hybrid laser structure emitting at 400 nm combining n-type AlGaN cladding and InGaN active region grown by metal-organic vapor phase epitaxy, with the p-doped waveguide and cladding layers grown by NH{sub 3}-MBE. Single-mode ridge-waveguide LD exhibits a threshold voltage as low as 4.3 V for an 800 × 2 μm{sup 2} ridge dimension and a threshold current density of ∼5 kA cm{sup −2} in continuous wave operation. The series resistance of the device is 6 Ω and the resistivity is 1.5 Ω cm, confirming thereby the excellent electrical properties of p-type Al{sub 0.06}Ga{sub 0.94}N:Mg despite the low growth temperature.

  16. High-resistance GaN epilayers with low dislocation density via growth mode modification

    Science.gov (United States)

    Xu, Z. Y.; Xu, F. J.; Wang, J. M.; Lu, L.; Yang, Z. J.; Wang, X. Q.; Shen, B.

    2016-09-01

    High-resistance GaN with low dislocation density adopting growth mode modification has been investigated by metalorganic chemical vapor deposition. The sheet resistance of the order of 1016 Ω/sq has been achieved at room temperature by diminishing the oxygen impurity level close to the substrate with an AlN blocking layer. Attributed to this method which offers more freedom to tailor the growth mode, a three-dimensional (3D) growth process is introduced by adjusting the growth pressure and temperature at the initial stage of the GaN epitaxy to improve the crystalline quality. The large 3D GaN grains formed during this period roughen the surface, and the following coalescence of the GaN grains causes threading dislocations bending, which finally remarkably reduces the dislocation density.

  17. Optical properties of pure and Ce{sup 3+} doped gadolinium gallium garnet crystals and epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Syvorotka, I.I. [Scientific Research Company “Carat”, 202 Stryjska Street, Lviv 79031 (Ukraine); Sugak, D. [Scientific Research Company “Carat”, 202 Stryjska Street, Lviv 79031 (Ukraine); Lviv Polytechnic National University, 12, S. Bandera Street, Lviv, 79013 (Ukraine); Wierzbicka, A. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Wittlin, A. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Cardinal Stefan Wyszyński University in Warsaw, ul. Dewajtis 5, 01-815 Warsaw (Poland); Przybylińska, H. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Barzowska, J. [Institute of Experimental Physics, Gdańsk University, ul. Wita Stwosza 57, Gdańsk (Poland); Barcz, A. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw (Poland); Berkowski, M.; Domagała, J. [Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw (Poland); Mahlik, S.; Grinberg, M. [Institute of Experimental Physics, Gdańsk University, ul. Wita Stwosza 57, Gdańsk (Poland); Ma, Chong-Geng [College of Mathematics and Physics, Chongqing University of Posts and Telecommunications, Chongqing 400065 (China); and others

    2015-08-15

    Results of X-ray diffraction and low temperature optical absorption measurements of cerium doped gadolinium gallium garnet single crystals and epitaxial layers are reported. In the region of intra-configurational 4f–4f transitions the spectra of the bulk crystals exhibit the signatures of several different Ce{sup 3+} related centers. Apart from the dominant center, associated with Ce substituting gadolinium, at least three other centers are found, some of them attributed to the so-called antisite locations of rare-earth ions in the garnet host, i.e., in the Ga positions. X-ray diffraction data prove lattice expansion of bulk GGG crystals due to the presence of rare-earth antisites. The concentration of the additional Ce-related centers in epitaxial layers is much lower than in the bulk crystals. However, the Ce-doped layers incorporate a large amount of Pb from flux, which is the most probable source of nonradiative quenching of Ce luminescence, not observed in crystals grown by the Czochralski method. - Highlights: • Ce{sup 3+} multicenters found in Gadolinium Gallium Garnet crystals and epitaxial layers. • High quality epitaxial layers of pure and Ce-doped GGG were grown. • Luminescence quenching of Ce{sup 3+} by Pb ions from flux detected in GGG epitaxial layers. • X-ray diffraction allows measuring the amount of the rare-earth antisites in GGG.

  18. Effects of growth temperature on high-quality In0.2Ga0.8N layers by plasma-assisted molecular beam epitaxy

    Institute of Scientific and Technical Information of China (English)

    Zhang Dongyan; Zheng Xinhe; Li Xuefei; Wu Yuanyuan; Wang Jianfeng; Yang Hui

    2012-01-01

    High-quality In0.2Ga0.8N epilayers were grown on a GaN template at temperatures of 520 and 580 ℃ via plasma-assisted molecular beam epitaxy.The X-ray rocking curve full widths at half maximum (FWHM) of (10.2)reflections is 936 arcsec for the 50-nm-thick InGaN layers at the lower temperature.When the growth temperature increases to 580 ℃,the FWHM of (00.2) reflections for these samples is very narrow and keeps similar,while significant improvement of(10.2) reflections with an FWHM value of 612 arcsec has been observed.This improved quality in InGaN layers grown at 580 ℃ is also reflected by the much larger size of the crystalline column from the AFM results,stronger emission intensity as well as a decreased FWHM of room temperature PL from 136 to 93.9 meV.

  19. Atomic layer deposition of perovskite oxides and their epitaxial integration with Si, Ge, and other semiconductors

    Energy Technology Data Exchange (ETDEWEB)

    McDaniel, Martin D.; Ngo, Thong Q.; Hu, Shen; Ekerdt, John G., E-mail: ekerdt@utexas.edu [Department of Chemical Engineering, The University of Texas at Austin, Austin, Texas 78712 (United States); Posadas, Agham; Demkov, Alexander A. [Department of Physics, The University of Texas at Austin, Austin, Texas 78712 (United States)

    2015-12-15

    Atomic layer deposition (ALD) is a proven technique for the conformal deposition of oxide thin films with nanoscale thickness control. Most successful industrial applications have been with binary oxides, such as Al{sub 2}O{sub 3} and HfO{sub 2}. However, there has been much effort to deposit ternary oxides, such as perovskites (ABO{sub 3}), with desirable properties for advanced thin film applications. Distinct challenges are presented by the deposition of multi-component oxides using ALD. This review is intended to highlight the research of the many groups that have deposited perovskite oxides by ALD methods. Several commonalities between the studies are discussed. Special emphasis is put on precursor selection, deposition temperatures, and specific property performance (high-k, ferroelectric, ferromagnetic, etc.). Finally, the monolithic integration of perovskite oxides with semiconductors by ALD is reviewed. High-quality epitaxial growth of oxide thin films has traditionally been limited to physical vapor deposition techniques (e.g., molecular beam epitaxy). However, recent studies have demonstrated that epitaxial oxide thin films may be deposited on semiconductor substrates using ALD. This presents an exciting opportunity to integrate functional perovskite oxides for advanced semiconductor applications in a process that is economical and scalable.

  20. Si Complies with GaN to Overcome Thermal Mismatches for the Heteroepitaxy of Thick GaN on Si.

    Science.gov (United States)

    Tanaka, Atsunori; Choi, Woojin; Chen, Renjie; Dayeh, Shadi A

    2017-10-01

    Heteroepitaxial growth of lattice mismatched materials has advanced through the epitaxy of thin coherently strained layers, the strain sharing in virtual and nanoscale substrates, and the growth of thick films with intermediate strain-relaxed buffer layers. However, the thermal mismatch is not completely resolved in highly mismatched systems such as in GaN-on-Si. Here, geometrical effects and surface faceting to dilate thermal stresses at the surface of selectively grown epitaxial GaN layers on Si are exploited. The growth of thick (19 µm), crack-free, and pure GaN layers on Si with the lowest threading dislocation density of 1.1 × 107 cm-2 achieved to date in GaN-on-Si is demonstrated. With these advances, the first vertical GaN metal-insulator-semiconductor field-effect transistors on Si substrates with low leakage currents and high on/off ratios paving the way for a cost-effective high power device paradigm on an Si CMOS platform are demonstrated. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  1. Characterization of (211) and (100) CdTe Layers Grown on Si Substrates by Metalorganic Vapor-Phase Epitaxy

    Science.gov (United States)

    Yasuda, K.; Niraula, M.; Kojima, M.; Kitagawa, S.; Tsubota, S.; Yamaguchi, T.; Ozawa, J.; Agata, Y.

    2017-11-01

    Single-crystal (211) and (100) CdTe layers have been grown by metalorganic vapor-phase epitaxy using the same condition on (211) and (100) Si substrates, respectively. Prior to the growth, substrates of both orientations were pretreated using the same pretreatment procedure. The crystal qualities of the grown layers were evaluated by full-width at half-maximum values of double-crystal x-ray rocking curves, and photoluminescence spectra at 4.2 K. (211) CdTe layers showed better crystallinity than (100) layers. The crystal quality of the (100) CdTe layers was also compared with that of layers grown on an epitaxial (100) GaAs layer on Si substrate. The results suggest that (100) CdTe layers with improved crystal quality could be obtained by optimizing the procedure of the Si substrates.

  2. Increasing the radiation resistance of single-crystal silicon epitaxial layers

    Directory of Open Access Journals (Sweden)

    Kurmashev Sh. D.

    2014-12-01

    Full Text Available The authors investigate the possibility of increasing the radiation resistance of silicon epitaxial layers by creating radiation defects sinks in the form of dislocation networks of the density of 109—1012 m–2. Such networks are created before the epitaxial layer is applied on the front surface of the silicon substrate by its preliminary oxidation and subsequent etching of the oxide layer. The substrates were silicon wafers KEF-4.5 and KDB-10 with a diameter of about 40 mm, grown by the Czochralski method. Irradiation of the samples was carried out using electron linear accelerator "Electronics" (ЭЛУ-4. Energy of the particles was 2,3—3,0 MeV, radiation dose 1015—1020 m–2, electron beam current 2 mA/m2. It is shown that in structures containing dislocation networks, irradiation results in reduction of the reverse currents by 5—8 times and of the density of defects by 5—10 times, while the mobility of the charge carriers is increased by 1,2 times. Wafer yield for operation under radiation exposure, when the semiconductor structures are formed in the optimal mode, is increased by 7—10% compared to the structures without dislocation networks. The results obtained can be used in manufacturing technology for radiation-resistant integrated circuits (bipolar, CMOS, BiCMOS, etc..

  3. Arsenic-Doped High-Resistivity-Silicon Epitaxial Layers for Integrating Low-Capacitance Diodes

    Directory of Open Access Journals (Sweden)

    Jaber Derakhshandeh

    2011-12-01

    Full Text Available An arsenic doping technique for depositing up to 40-μm-thick high-resistivity layers is presented for fabricating diodes with low RC constants that can be integrated in closely-packed configurations. The doping of the as-grown epi-layers is controlled down to 5 × 1011 cm−3, a value that is solely limited by the cleanness of the epitaxial reactor chamber. To ensure such a low doping concentration, first an As-doped Si seed layer is grown with a concentration of 1016 to 1017 cm−3, after which the dopant gas arsine is turned off and a thick lightly-doped epi-layer is deposited. The final doping in the thick epi-layer relies on the segregation and incorporation of As from the seed layer, and it also depends on the final thickness of the layer, and the exact growth cycles. The obtained epi-layers exhibit a low density of stacking faults, an over-the-wafer doping uniformity of 3.6%, and a lifetime of generated carriers of more than 2.5 ms. Furthermore, the implementation of a segmented photodiode electron detector is demonstrated, featuring a 30 pF capacitance and a 90 Ω series resistance for a 7.6 mm2 anode area.

  4. Electrical characterization of all-epitaxial Fe/GaN(0001) Schottky tunnel contacts

    Energy Technology Data Exchange (ETDEWEB)

    Fernandez-Garrido, Sergio; Ubben, Kai U.; Herfort, Jens; Gao Cunxu; Brandt, Oliver [Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7, D-10117 Berlin (Germany)

    2012-07-16

    We analyze the properties of Fe Schottky contacts prepared in situ on n-type GaN(0001) by molecular beam epitaxy. In particular, we investigate the suitability of these epitaxial Fe layers for electrical spin injection. Current-voltage-temperature measurements demonstrate pure field emission for Fe/GaN:Si Schottky diodes with [Si]=5 Multiplication-Sign 10{sup 18} cm{sup -3}. The Schottky barrier height of the clean, epitaxial Fe/GaN interface is determined by both current-voltage-temperature and capacitance-voltage techniques to be (1.47{+-}0.09)eV.

  5. Molecular-beam epitaxy of mercury-iron selenide layers and quantum wells

    Science.gov (United States)

    Schikora, D.; Widmer, Th.; Lischka, K.; Schäfer, P.; Machel, G.; Luther, S.; von Ortenberg, M.

    1996-02-01

    Epitaxial layers and single quantum wells (SQW) of Fermi-level pinned mercury-iron selenide (HgSe:Fe) have been grown by molecular beam epitaxy on ZnTe buffer layers and characterised by in- situ high-energy electron diffraction (RHEED) and high-field magnetospectroscopy investigations. The onset of strain relaxation at the critical thickness has been determined by time-dependent intensity-profile analysis of different reflections in the RHEED pattern. A growth mode transition has been identified from 2D- to a 3D growth mode, which coincides exactly with the critical thickness equilibrium value of about 61 nm predicted by the Matthews-Blakeslee theory. Hall effect measurements have been performed to determine the iron concentration in the HgSe layers below and above the Fermi-level pinning threshold-concentration. With increasing iron concentration a pronounced increase of the mobility has been found in the layers according to the predictions of a short-range correlation theory (SRC). The maximum carrier mobility of about 2.7 × 10 5cm -3 measured in a 1.5 μm thick HgSe:Fe-layer indicates that long-range correlations have also to be considered in the transport mechanism of mercury-iron selenide. Different types of HgSe:Fe-SQW and a {HgSe:Fe}/{HgSe} superlattice have been analyzed by Shubnikov-de Haas (SdH) measurements and Hall effect measurements in magnetic fields up to 30 T. The existence of a two-dimensional electron system (Q2D) in the SQW has been confirmed by the cosine dependence of the SdH-oscillation period. The dependence of the subband splitting in the SQW on the quantum well width has been investigated by Hall-resistance measurements.

  6. Epitaxial graphene

    OpenAIRE

    de Heer, Walt A.; Berger, Claire; Wu, Xiaosong; First, Phillip N.; Conrad, Edward H.; Li, Xuebin; Li, Tianbo; Sprinkle, Michael; Hass, Joanna; Sadowski, Marcin L.; Potemski, Marek; Martinez, Gerard

    2007-01-01

    Graphene multilayers are grown epitaxially on single crystal silicon carbide. This system is composed of several graphene layers of which the first layer is electron doped due to the built-in electric field and the other layers are essentially undoped. Unlike graphite the charge carriers show Dirac particle properties (i.e. an anomalous Berry's phase, weak anti-localization and square root field dependence of the Landau level energies). Epitaxial graphene shows quasi-ballistic transport and l...

  7. Eliminating stacking faults in semi-polar GaN by AlN interlayers

    Energy Technology Data Exchange (ETDEWEB)

    Dadgar, A.; Ravash, R.; Veit, P.; Schmidt, G.; Mueller, M.; Dempewolf, A.; Bertram, F.; Wieneke, M.; Christen, J.; Krost, A. [Otto-von-Guericke-Universitaet Magdeburg, Institut fuer Experimentelle Physik, Fakultaet fuer Naturwissenschaften, Universitaetsplatz 2, 39106 Magdeburg (Germany)

    2011-07-11

    We report on the elimination of stacking faults by the insertion of low-temperature AlN interlayers in nearly (1016) and (1104) oriented semi-polar GaN grown by metalorganic vapor phase epitaxy on Si(112) and Si(113), respectively. The elimination of these defects is visualized by cathodoluminescence (CL) as well as scanning transmission electron microscopy (STEM) and STEM-CL. A possible annihilation mechanism is discussed which leads to the conclusion that the elimination mechanism is most likely valid for all layers with (1101) surfaces, enabling heteroepitaxial semi- and non-polar GaN free from stacking faults.

  8. Extraordinary N atom tunneling in formation of InN shell layer on GaN nanorod m-plane sidewall.

    Science.gov (United States)

    Cai, Duanjun; Lin, Na; Xu, Hongmei; Liao, Che-Hao; Yang, C C

    2014-12-12

    We report the extraordinary tunneling process that finds the lower cohesive energy route for stablizing InN shell layer on m-plane sidewall of GaN nanorod. The [0001] orientated GaN nanorod array is grown on sapphire substrate patterned with Ga nanoparticle by metal-organic vapor deposition method, based on which the simulation structures of c-plane top surface and m-plane sidewall surface is constructed for the first-principles calculations. The results show that the introduction of In wetting monolayer could effectively lower the cohesive energy of adalayers on non-polar GaN surfaces. Most importantly, it is revealed that there exists an extraordinary tunneling process in which the N atoms will drag out the In wetting atoms and tunnel through to form stable InN shell layer on the nanorod sidewall.

  9. Effect of Si doping on cubic GaN films grown on GaAs(1 0 0)

    Science.gov (United States)

    Xu, Dapeng; Yang, Hui; Li, J. B.; Li, S. F.; Wang, Y. T.; Zhao, D. G.; Wu, R. H.

    1999-10-01

    Epitaxial layers of cubic GaN have been grown by metalorganic vapor-phase epitaxy (MOVPE) with Si-doping carrier concentration ranging from 3×10 18 to 2.4×10 20/cm 3. Si-doping decreased the yellow emission of GaN. However, the heavily doped n-type material has been found to induce phase transformation. As the Si-doping concentration increases, the hexagonal GaN nanoparticles increase. Judged from the linewidth of X-ray rocking curve, Si-doping increases the density of dislocations and stacking faults. Based on these observations, a model is proposed to interpret the phase transformation induced by the generated microdefects, such as dislocations and precipitates, and induced stacking faults under heavy Si-doping.

  10. Morphological and microstructural stability of N-polar InAlN thin films grown on free-standing GaN substrates by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Hardy, Matthew T., E-mail: matthew.hardy.ctr@nrl.navy.mil; Storm, David F.; Downey, Brian P.; Katzer, D. Scott; Meyer, David J. [Electronics Science and Technology Division, Naval Research Laboratory, 4555 Overlook Avenue SW, Washington DC 20375 (United States); McConkie, Thomas O.; Smith, David J. [Department of Physics, Arizona State University, Tempe, Arizona 85287-1504 (United States); Nepal, Neeraj [Sotera Defense Solutions, 2200 Defense Hwy Suite 405, Crofton, Maryland 21114 (United States)

    2016-03-15

    The sensitivity of the surface morphology and microstructure of N-polar-oriented InAlN to variations in composition, temperature, and layer thickness for thin films grown by plasma-assisted molecular beam epitaxy (PAMBE) has been investigated. Lateral compositional inhomogeneity is present in N-rich InAlN films grown at low temperature, and phase segregation is exacerbated with increasing InN fraction. A smooth, step-flow surface morphology and elimination of compositional inhomogeneity can be achieved at a growth temperature 50 °C above the onset of In evaporation (650 °C). A GaN/AlN/GaN/200-nm InAlN heterostructure had a sheet charge density of 1.7 × 10{sup 13 }cm{sup −2} and no degradation in mobility (1760 cm{sup 2}/V s) relative to 15-nm-thick InAlN layers. Demonstration of thick-barrier high-electron-mobility transistors with good direct-current characteristics shows that device quality, thick InAlN layers can be successfully grown by PAMBE.

  11. Surface analysis of topmost layer of epitaxial layered oxide thin film: Application to delafossite oxide for oxygen evolution reaction

    Science.gov (United States)

    Toyoda, Kenji; Adachi, Hideaki; Miyata, Nobuhiro; Hinogami, Reiko; Orikasa, Yuki; Uchimoto, Yoshiharu

    2018-02-01

    Delafossite oxides (ABO2) have a layered structure with alternating layers of A and B elements, the topmost layer of which appears to determine their performance, such as the oxygen evolution reaction (OER) activity. In this study, we investigated the topmost layer of single-domain (0 0 1)-oriented AgCoO2 epitaxial thin film for potential use as an OER catalyst. The thin film was confirmed to possess OER activity at a level comparable to the catalyst in powder form. Atomic scattering spectroscopy revealed the topmost layer to be composed of CoO6 octahedra. In situ X-ray absorption spectroscopy showed that the oxidation of Co at the surface did not change under different potentials, which suggests that there is no valence fluctuation of Co in the stable CoO6 octahedral structure. However, the oxidation number of Co at the surface was lower than that in the bulk. Our density functional theoretical calculations also showed the Co atoms at the surface to have a slightly higher electron occupancy than those in the bulk, and suggests that the unoccupied t2g states of Co at the surface have an influence on OER activity.

  12. Anti-phase domains in cubic GaN

    Energy Technology Data Exchange (ETDEWEB)

    Maria Kemper, Ricarda; Schupp, Thorsten; Haeberlen, Maik; Lindner, Joerg; Josef As, Donat [University of Paderborn, Department of Physics, Warburger Str. 100, D-33098 Paderborn (Germany); Niendorf, Thomas; Maier, Hans-Juergen [University of Paderborn, Lehrstuhl fuer Werkstoffkunde, Pohlweg 47-49, D-33098 Paderborn (Germany); Dempewolf, Anja; Bertram, Frank; Christen, Juergen [University of Magdeburg, Institut fuer Festkoerperphysik, P.O. Box 4120, D-39016 Magdeburg (Germany); Kirste, Ronny; Hoffmann, Axel [Technische Universitaet Berlin, Institute of Solid State Physics, Hardenbergstr. 36, D-10623 Berlin (Germany)

    2011-12-15

    The existence of anti-phase domains in cubic GaN grown on 3C-SiC/Si (001) substrates by plasma-assisted molecular beam epitaxy is reported. The influence of the 3C-SiC/Si (001) substrate morphology is studied with emphasis on the anti-phase domains (APDs). The GaN nucleation is governed by the APDs of the substrate, resulting in equal plane orientation and the same anti-phase boundaries. The presence of the APDs is independent of the GaN layer thickness. Atomic force microscopy surface analysis indicates lateral growth anisotropy of GaN facets in dependence of the APD orientation. This anisotropy can be linked to Ga and N face types of the {l_brace}111{r_brace} planes, similar to observations of anisotropic growth in 3C-SiC. In contrast to 3C-SiC, however, a difference in GaN phase composition for the two types of APDs can be measured by electron backscatter diffraction, {mu}-Raman and cathodoluminescence spectroscopy.

  13. Analysis of reaction between c+a and -c+a dislocations in GaN layer grown on 4-inch Si(111 substrate with AlGaN/AlN strained layer superlattice by transmission electron microscopy

    Directory of Open Access Journals (Sweden)

    Yoshihiro Sugawara

    2016-04-01

    Full Text Available The behavior of dislocations in a GaN layer grown on a 4-inch Si(111 substrate with an AlGaN/AlN strained layer superlattice using horizontal metal-organic chemical vapor deposition was observed by transmission electron microscopy. Cross-sectional observation indicated that a drastic decrease in the dislocation density occurred in the GaN layer. The reaction of a dislocation (b=1/3[-211-3] and anothor dislocation (b =1/3[-2113] to form one dislocation (b =2/3[-2110] in the GaN layer was clarified by plan-view observation using weak-beam dark-field and large-angle convergent-beam diffraction methods.

  14. Crystal tilting in GaN grown by pendoepitaxy method on sapphire substrate

    Science.gov (United States)

    Kim, Ig-Hyeon; Sone, C.; Nam, Ok-Hyun; Park, Yong-Jo; Kim, Taeil

    1999-12-01

    Pendeoepitaxy of GaN on sapphire substrate with SiO2 mask is demonstrated and characterized by transmission electron microscopy and double crystal x-ray diffraction. A continuous layer of GaN with low dislocation density was achieved by this method. Parts of the GaN layer are tilted symmetrically toward [11-20] direction and have two kinds of coalesce and tilt boundaries. Each boundary was formed by a vertical array of piled up dislocations with the Burger's vector of [11-20]. The tilting mechanism in pendeo-epitaxy is discussed in terms of surface interaction between the SiO2 mask and ELO-GaN.

  15. Microstructures and growth mechanisms of GaN films epitaxially grown on AlN/Si hetero-structures by pulsed laser deposition at different temperatures

    Science.gov (United States)

    Wang, Wenliang; Yang, Weijia; Lin, Yunhao; Zhou, Shizhong; Li, Guoqiang

    2015-11-01

    2 inch-diameter GaN films with homogeneous thickness distribution have been grown on AlN/Si(111) hetero-structures by pulsed laser deposition (PLD) with laser rastering technique. The surface morphology, crystalline quality, and interfacial property of as-grown GaN films are characterized in detail. By optimizing the laser rastering program, the ~300 nm-thick GaN films grown at 750 °C show a root-mean-square (RMS) thickness inhomogeneity of 3.0%, very smooth surface with a RMS surface roughness of 3.0 nm, full-width at half-maximums (FWHMs) for GaN(0002) and GaN(102) X-ray rocking curves of 0.7° and 0.8°, respectively, and sharp and abrupt AlN/GaN hetero-interfaces. With the increase in the growth temperature from 550 to 850 °C, the surface morphology, crystalline quality, and interfacial property of as-grown ~300 nm-thick GaN films are gradually improved at first and then decreased. Based on the characterizations, the corresponding growth mechanisms of GaN films grown on AlN/Si hetero-structures by PLD with various growth temperatures are hence proposed. This work would be beneficial to understanding the further insight of the GaN films grown on Si(111) substrates by PLD for the application of GaN-based devices.

  16. Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kizir, Seda; Haider, Ali; Biyikli, Necmi, E-mail: biyikli@unam.bilkent.edu.tr [National Nanotechnology Research Center (UNAM), Bilkent University, Bilkent, Ankara 06800, Turkey and Institute of Materials Science and Nanotechnology, Bilkent University, Bilkent, Ankara 06800 (Turkey)

    2016-07-15

    Gallium nitride (GaN) thin films were grown on Si (100), Si (111), and c-plane sapphire substrates at 200 °C via hollow-cathode plasma-assisted atomic layer deposition (HCPA-ALD) using GaEt{sub 3} and N{sub 2}/H{sub 2} plasma as group-III and V precursors, respectively. The main aim of the study was to investigate the impact of substrate on the material properties of low-temperature ALD-grown GaN layers. Structural, chemical, and optical characterizations were carried out in order to evaluate and compare film quality of GaN on different substrates. X-ray reflectivity measurements showed film density values of 5.70, 5.74, and 5.54 g/cm{sup 3} for GaN grown on Si (100), Si (111), and sapphire, respectively. Grazing incidence x-ray diffraction measurements exhibited hexagonal wurtzite structure in all HCPA-ALD grown GaN samples. However, dominant diffraction peak for GaN films grown on Si and sapphire substrates were detected differently as (002) and (103), respectively. X-ray diffraction gonio scans measured from GaN grown on c-plane sapphire primarily showed (002) orientation. All samples exhibited similar refractive index values (∼2.17 at 632 nm) with 2–3 at. % of oxygen impurity existing within the bulk of the films. The grain size was calculated as ∼9–10 nm for GaN grown on Si (100) and Si (111) samples while it was ∼5 nm for GaN/sapphire sample. Root-mean-square surface roughness values found as 0.68, 0.76, and 1.83 nm for GaN deposited on Si (100), Si (111), and sapphire, respectively. Another significant difference observed between the samples was the film growth per cycle: GaN/sapphire sample showed a considerable higher thickness value when compared with GaN/Si samples, which might be attributed to a possibly more-efficient nitridation and faster nucleation of sapphire surface.

  17. Analysis of reaction between c+a and -c+a dislocations in GaN layer grown on 4-inch Si(111) substrate with AlGaN/AlN strained layer superlattice by transmission electron microscopy

    National Research Council Canada - National Science Library

    Sugawara, Yoshihiro; Ishikawa, Yukari; Watanabe, Arata; Miyoshi, Makoto; Egawa, Takashi

    2016-01-01

    The behavior of dislocations in a GaN layer grown on a 4-inch Si(111) substrate with an AlGaN/AlN strained layer superlattice using horizontal metal-organic chemical vapor deposition was observed by transmission electron microscopy...

  18. Influence of layer thickness on the structure and the magnetic properties of Co/Pd epitaxial multilayer films

    Energy Technology Data Exchange (ETDEWEB)

    Tobari, Kousuke, E-mail: tobari@futamoto.elect.chuo-u.ac.jp [Faculty of Science and Engineering, Chuo University, Bunkyo-ku, Tokyo 112-8551 (Japan); Ohtake, Mitsuru; Nagano, Katsumasa; Futamoto, Masaaki [Faculty of Science and Engineering, Chuo University, Bunkyo-ku, Tokyo 112-8551 (Japan)

    2012-03-15

    Co/Pd epitaxial multilayer films were prepared on Pd(111){sub fcc} underlayers hetero-epitaxially grown on MgO(111){sub B1} single-crystal substrates at room temperature by ultra-high vacuum RF magnetron sputtering. In-situ reflection high energy electron diffraction shows that the in-plane lattice spacing of Co on Pd layer gradually decreases with increasing the Co layer thickness, whereas that of Pd on Co layer remains unchanged during the Pd layer formation. The CoPd alloy phase formation is observed around the Co/Pd interface. The atomic mixing is enhanced for thinner Co and Pd layers in multilayer structure. With decreasing the Co and the Pd layer thicknesses and increasing the repetition number of Co/Pd multilayer film, stronger perpendicular magnetic anisotropy is observed. The relationships between the film structure and the magnetic properties are discussed. - Highlights: Black-Right-Pointing-Pointer Epitaxial Co/Pd multilayer films are prepared on Pd(111){sub fcc} underlayers. Black-Right-Pointing-Pointer Lattice strain in Co layer and CoPd-alloy formation are noted around the interface. Black-Right-Pointing-Pointer Magnetic property dependence on layer thickness is reported.

  19. Growth of layered superconductor β-PdBi{sub 2} films using molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Denisov, N.V., E-mail: denisov@iacp.dvo.ru [Institute of Automation and Control Processes FEB RAS, 5 Radio Street, 690041 Vladivostok (Russian Federation); Matetskiy, A.V.; Tupkalo, A.V. [Institute of Automation and Control Processes FEB RAS, 5 Radio Street, 690041 Vladivostok (Russian Federation); Zotov, A.V. [Institute of Automation and Control Processes FEB RAS, 5 Radio Street, 690041 Vladivostok (Russian Federation); School of Natural Sciences, Far Eastern Federal University, 690950 Vladivostok (Russian Federation); Department of Electronics, Vladivostok State University of Economics and Service, 690600 Vladivostok (Russian Federation); Saranin, A.A. [Institute of Automation and Control Processes FEB RAS, 5 Radio Street, 690041 Vladivostok (Russian Federation); School of Natural Sciences, Far Eastern Federal University, 690950 Vladivostok (Russian Federation)

    2017-04-15

    Highlights: • Bulk β-PdBi{sub 2} is layered material with advanced properties of topological superconductor. • We present a method for growing β-PdBi{sub 2} films of a desired thickness. • Method utilizes MBE growth of β-PdBi{sub 2}, using Bi(111) film on Si(111) as a template. • Electronic and superconducting properties of the films are similar to those of bulk β-PdBi{sub 2}. - Abstract: Bulk β-PdBi{sub 2} layered material exhibits advanced properties and is supposed to be probable topological superconductor. We present a method based on molecular beam epitaxy that allows us to grow β-PdBi{sub 2} films from a single β-PdBi{sub 2} triple layer up to the dozens of triple layers, using Bi(111) film on Si(111) as a template. The grown films demonstrate structural, electronic and superconducting properties similar to those of bulk β-PdBi{sub 2} crystals. Ability to grow the β-PdBi{sub 2} films of desired thickness opens the promising possibilities to explore fascinating properties of this advanced material.

  20. Controlled Growth of Non-Uniform Arsenic Profiles in Silicon Reduced-Pressure Chemical Vapor Deposition Epitaxial Layers

    NARCIS (Netherlands)

    Popadic, M.; Scholtes, T.L.M.; De Boer, W.; Sarubbi, F.; Nanver, L.K.

    2009-01-01

    An empirical model of As surface segregation during reduced-pressure chemical vapor deposition Si epitaxy is presented. This segregation mechanism determines the resulting doping profile in the grown layer and is here described by a model of simultaneous and independent As adsorption and segregation

  1. Optimization studies of HgSe thin film deposition by electrochemical atomic layer epitaxy (EC-ALE)

    CSIR Research Space (South Africa)

    Venkatasamy, V

    2006-06-01

    Full Text Available Studies of the optimization of HgSe thin film deposition using electrochemical atomic layer epitaxy (EC-ALE) are reported. Cyclic voltammetry was used to obtain approximate deposition potentials for each element. These potentials were then coupled...

  2. Raman phonon modes of zinc blende InxGa1-xN alloy epitaxial layers

    Science.gov (United States)

    Tabata, A.; Leite, J. R.; Lima, A. P.; Silveira, E.; Lemos, V.; Frey, T.; As, D. J.; Schikora, D.; Lischka, K.

    1999-08-01

    Transverse-optical (TO) and longitudinal-optical (LO) phonons of zinc blende InxGa1-xN (0⩽x⩽0.31) layers are observed through first-order micro-Raman scattering experiments. The samples are grown by molecular-beam epitaxy on GaAs (001) substrates, and x-ray diffraction measurements are performed to determine the epilayer alloy composition. Both the TO and LO phonons exhibit a one-mode-type behavior, and their frequencies display a linear dependence on the composition. The Raman data reported here are used to predict the A1 (TO) and E1 (TO) phonon frequencies of the hexagonal InxGa1-xN alloy.

  3. Pendeo-epitaxial Growth and Characterization of III-Nitride Thin Films on SiC(0001) and Si(111) Substrates

    Science.gov (United States)

    Davis, Robert

    2002-03-01

    Conventional heteroepitaxial growth of GaN on low temperature GaN or AlN buffer layers previously deposited on Al2O3 and SiC substrates results in films containing a high dislocation density (1E8-1E10 cm-2) due to the lattice mismatches between the buffer layer and the film and/or the buffer layer and the substrate. The objective of this research has been the significant reduction in dislocation density in GaN thin films via special methods of metallorganic vapor phase growth. Lateral epitaxial overgrowth (LEO) of GaN stripes patterned in an SiO2 mask deposited on GaN film/AlN buffer layer/6H-SiC(0001) substrates was the initial method. The mask contained 3mm and 5mm wide stripe openings, spaced parallel at 3-40 mm, and oriented along and in the GaN film. The deposited material grew vertically to the top of the mask and then both laterally over the mask and vertically until coalescence. Threading dislocations, originating from the GaN/AlN buffer layer interface, propagated to the top surface of the regrown GaN layer within the window regions of the mask. By contrast, there were no observable threading dislocations in the overgrown portions of the layer. The few dislocations observed formed parallel to (0001) plane via the extension of the vertical threading dislocations after a 90^o bend in the regrown region. They did not subsequently propagate to the surface of the overgrown GaN layers. Recently we have pioneered a new process for selective epitaxy of GaN and AlGaN layers with a low-defect density, namely, pendeo (from the Latin: to hang or be suspended from)-epitaxy (PE). It incorporates mechanisms of growth exploited by conventional lateral overgrowth processes by using masks to prevent vertical propagation of threading defects, and extends the phenomenon to employ the substrate itself as a pseudo-mask. The growth does not initiate through open windows, rather it begins on sidewalls of forms etched into a seed layer and continues until coalescence over and

  4. Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH{sub 3}

    Energy Technology Data Exchange (ETDEWEB)

    Pansila, P. [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510 (Japan); Kanomata, K. [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510 (Japan); Japan Society for the Promotion of Science, 5-3-1 Kojimachi, Chiyoda-ku, Tokyo 102-0083 (Japan); Miura, M. [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510 (Japan); Ahmmad, B.; Kubota, S. [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510 (Japan); CREST, Japan Science and Technology Agency, 4-3-16 Jonan, Yonezawa 992-8510 (Japan); Hirose, F., E-mail: fhirose@yz.yamagata-u.ac.jp [Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa 992-8510 (Japan); CREST, Japan Science and Technology Agency, 4-3-16 Jonan, Yonezawa 992-8510 (Japan)

    2015-12-01

    Highlights: • We discuss the reaction mechanism of the low temperature GaN ALD. • The plasma-excited NH{sub 3} is effective in the nitridation of the TMG saturated GaN surface with surface temperatures in excess of 100 °C. • The temperature controlled ALD of GaN is examined using RT-TMG adsorption and plasma-excited NH{sub 3} treatment with the temperature of 115 °C. - Abstract: Fundamental surface reactions in the atomic layer deposition of GaN with trimethylgallium (TMG) and plasma-excited NH{sub 3} are investigated by multiple-internal-reflection infrared absorption spectroscopy (MIR-IRAS) at surface temperatures varying from room temperature (RT) to 400 °C. It is found that TMG is saturated at RT on GaN surfaces when the TMG exposure exceeds 8 × 10{sup 4} Langmuir (L), where 1 L corresponds to 1.33 × 10{sup −4} Pa s (or 1.0 × 10{sup −6} Torr s), and its saturation density reaches the maximum value at RT. Nitridation with the plasma-excited NH{sub 3} on the TMG-saturated GaN surface is investigated by X-ray photoelectron spectroscopy (XPS). The nitridation becomes effective at surface temperatures in excess of 100 °C. The reaction models of TMG adsorption and nitridation on the GaN surface are proposed in this paper. Based on the surface analysis, a temperature-controlled ALD process consisting of RT-TMG adsorption and nitridation at 115 °C is examined, where the growth per cycle of 0.045 nm/cycle is confirmed. XPS analysis indicates that all N atoms are bonded as GaN. Atomic force microscopy indicates an average roughness of 0.23 nm. We discuss the reaction mechanism of GaN ALD in the low-temperature region at around 115 °C with TMG and plasma-excited NH{sub 3}.

  5. Structural characteristics of single crystalline GaN films grown on (111) diamond with AlN buffer

    DEFF Research Database (Denmark)

    Pécz, Béla; Tóth, Lajos; Barna, Árpád

    2013-01-01

    , eliminated the inversion domains and reduced the density of threading dislocations in the GaN epilayers. The films have an in-plane epitaxial relationship [1010]GaN//[110]diamond. Thus GaN (0001) thin films of single epitaxial relationship and of single polarity were realised on diamond with AlN buffer....

  6. Morphology and photoluminescence of ZnO nanorods grown on sputtered GaN films with intermediate ZnO seed layer

    Energy Technology Data Exchange (ETDEWEB)

    Nandi, R. [Department of Physics, Indian Institute of Technology Bombay, Mumbai, 400076 (India); Srinivasa, R.S. [Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology Bombay, Mumbai, 400076 (India); Major, S.S., E-mail: syed@iitb.ac.in [Department of Physics, Indian Institute of Technology Bombay, Mumbai, 400076 (India)

    2016-10-01

    ZnO nanorods (NRs) were grown by chemical bath deposition on sputtered GaN over Si with and without sputtered ZnO seed layers. The effect of ZnO seed layer thickness, precursor concentration and growth temperature on the morphology and photoluminescence (PL) of ZnO-NRs has been studied. Scanning electron microscopy studies at different stages of growth have shown that the thickness of ZnO seed layer is critically important for controlling the growth behavior, morphology and density of ZnO-NRs on GaN surface. ZnO-NRs on bare GaN/Si grow with a large diameter and small aspect ratio of ∼4, displaying the tendency of lateral growth. Introduction of a thin ZnO seed layer (10 nm) under optimized precursor concentration and temperature drastically increases the aspect ratio to ∼16, due to partial coverage of ZnO on GaN surface and a moderate density of nucleation with small critical size. ZnO seed layers of higher thickness (50 nm and 100 nm) result in reduced aspect ratio due to increase in nucleation density and limited availability of reacting species. Increase in precursor concentration results in pronounced lateral growth and the decrease in growth temperature also results in compact nanorods with reduced aspect ratios. Room temperature photoluminescence (PL) studies show that ZnO-NRs on GaN, grown with or without ZnO seed layer under optimized precursor concentration and temperature, display high near-band-edge luminescence and negligible defect emission, compared to the nanorods on a ZnO seed layer over Si, as well as those grown at higher precursor concentration and lower temperatures. The enhanced PL is attributed to the absence of crystalline defects at nanorod interfaces due to lateral coalescence, arising from the moderate density and slight misalignment of the nanorods. - Highlights: • ZnO nanorods grown on sputtered GaN film display strong tendency of lateral growth. • Nanorods grown on 10 nm ZnO/GaN display moderate density and high aspect ratios.

  7. Temperature dependence of photoluminescence from ordered GaInP{sub 2} epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Prutskij, T. [Instituto de Ciencias, BUAP, Apartado Postal 207, 72000 Puebla, Pue. (Mexico); Pelosi, C. [IMEM/CNR, Parco Area delle Scienze 37/A, 43010 Parma (Italy)

    2010-01-15

    The temperature behavior of the integrated intensity of photoluminescence (PL) emission from ordered GaInP{sub 2} epitaxial layer was measured at temperatures of 10 - 300 K. Within this temperature range the PL emission is dominated by band-to-band radiative recombination. The PL intensity temperature dependence has two regions: at low temperatures it quenches rapidly as the temperature increases, and above 100 K it reduces slowly. This temperature behavior is compared with that of disordered GaInP{sub 2} layer. The specter of the PL emission of the disordered layer has two peaks, which are identified as due to donor-accepter (D-A) and band-to-band recombination. The PL intensity quenching of these spectral bands is very different: With increasing temperature, the D-A peak intensity remains almost unchanged at low temperatures and then decreases at a higher rate. The intensity of the band-to-band recombination peak decays gradually, having a higher rate at low temperatures than at higher temperatures. Comparing these temperature dependencies of these PL peaks of ordered and disordered alloys and the temperature behavior of their full width at half maximum (FWHM), we conclude that the different morphology of these alloys causes their different temperature behavior. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  8. Magneto-optical properties of the Ca:(yttrium iron garnet) epitaxial-layer-substrate interface on gadolinium gallium garnet

    Science.gov (United States)

    Gualtieri, D. M.

    1990-05-01

    Calcium oxide is a growth rate inhibitor of the liquid-phase epitaxy (LPE) of garnet layers. Calcium oxide additions to a melt for the growth of yttrium iron garnet (YIG) will reduce the epitaxial growth rate from its typical value of 1.0 to 0.1 μm/min [W. H. De Roode and J. M. Robertson, J. Cryst. Growth 63, 105 (1983)], allowing precise thickness control for the fabrication of optical waveguides and magnetic heterostructures. LPE growth of YIG from calcium-free melts produces a 0.1-0.5 μm interface layer between the YIG layer and the gadolinium gallium garnet (GGG) substrate. This interface is caused by a transient crystal growth that occurs before equilibrium epitaxy, and it consists of a nonstoichiometric layer composition that includes flux and impurity components. Calcium oxide addition would be especially useful if it reduced the thickness of the interface layer in proportion to its inhibition of growth rate. This, however, is not the case. A series of Ca:YIG layers was grown by LPE on GGG substrates in the thickness range 0.05-10 μm. Faraday rotation spectroscopy in the wavelength range 475-575 nm distinguished the layer, interface, and substrate contributions to the optical rotation and revealed the presence of a 0.25-μm-thick interface layer with properties characteristic of Pb-substituted YIG. Double-crystal x-ray diffraction confirmed the existence of the interface by the angular broadening of the layer diffraction and a shifting to lattice constants intermediate between YIG and GGG as the layer thickness decreased. The importance of this interface as a graded refractive index layer in optical waveguides should not be overlooked.

  9. Evidence of phase separation in cubic InxGa1-xN epitaxial layers by resonant Raman scattering

    Science.gov (United States)

    Silveira, E.; Tabata, A.; Leite, J. R.; Trentin, R.; Lemos, V.; Frey, T.; As, D. J.; Schikora, D.; Lischka, K.

    1999-12-01

    Phase separation effects in cubic InxGa1-xN epitaxial layers were investigated by means of resonant Raman scattering. The alloy epilayers were grown by radio-frequency plasma-assisted molecular beam epitaxy on GaAs (001) substrates. The results, which are confirmed by x-ray diffractometry (XRD) experiments, show the presence of In-rich inclusions in c-InGaN layers with x=0.19 and 0.33. In-rich inclusions were also found by XRD in a lower In-content layer with x=0.07. Compositional inhomogeneity of about 10% was observed through selective resonances of localized regions in the In-rich separated inclusions. We find that the In-rich separated phase has nearly the same composition in all analyzed samples (x≅0.8).

  10. DOE-EPSCoR. Exchange interactions in epitaxial intermetallic layered systems

    Energy Technology Data Exchange (ETDEWEB)

    LeClair, Patrick R. [Univ. of Alabama, Tuscaloosa, AL (United States); Gary, Mankey J. [Univ. of Alabama, Tuscaloosa, AL (United States)

    2015-05-25

    The goal of this research is to develop a fundamental understanding of the exchange interactions in epitaxial intermetallic alloy thin films and multilayers, including films and multilayers of Fe-Pt, Co-Pt and Fe-P-Rh alloys deposited on MgO and Al2O3 substrates. Our prior results have revealed that these materials have a rich variety of ferromagnetic, paramagnetic and antiferromagnetic phases which are sensitive functions of composition, substrate symmetry and layer thickness. Epitaxial antiferromagnetic films of FePt alloys exhibit a different phase diagram than bulk alloys. The antiferromagnetism of these materials has both spin ordering transitions and spin orienting transitions. The objectives include the study of exchange-inversion materials and the interface of these materials with ferromagnets. Our aim is to formulate a complete understanding of the magnetic ordering in these materials, as well as developing an understanding of how the spin structure is modified through contact with a ferromagnetic material at the interface. The ultimate goal is to develop the ability to tune the phase diagram of the materials to produce layered structures with tunable magnetic properties. The alloy systems that we will study have a degree of complexity and richness of magnetic phases that requires the use of the advanced tools offered by the DOE-operated national laboratory facilities, such as neutron and x-ray scattering to measure spin ordering, spin orientations, and element-specific magnetic moments. We plan to contribute to DOE’s mission of producing “Materials by Design” with properties determined by alloy composition and crystal structure. We have developed the methods for fabricating and have performed neutron diffraction experiments on some of the most interesting phases, and our work will serve to answer questions raised about the element-specific magnetizations using the magnetic x-ray dichroism techniques and interface magnetism in layered structures

  11. Epitaxial Lateral Overgrowth of Semiconductors

    Science.gov (United States)

    Zytkiewicz, Zbigniew R.

    The state of the art and recent developments of lateral overgrowth of compound semiconductors are reviewed. First we focus on the mechanism of epitaxial lateral overgrowth (ELO) from the liquid phase, highlighting the phenomena that are crucial for growing high-quality layers with large aspect ratio. Epitaxy from the liquid phase has been chosen since the equilibrium growth techniques such as liquid-phase epitaxy (LPE) are the most suitable for lateral overgrowth. We then present numerous examples for which the defect filtration in the ELO procedure is very efficient and leads to significant progress in the development of high-performance semiconductor devices made of lattice-mismatched structures. Structural perfection of seams that appear when layers grown from neighboring seeds merge is also discussed. Next, we concentrate on strain commonly found in various ELO structures and arising due to the interaction of ELO layers with the mask. Its origin, and possible ways of its control, are presented. Then we show that the thermal strain in lattice-mismatched ELO structures can be relaxed by additional tilting of ELO wings while still preserving their high quality. Finally, recent progresses in the lateral overgrowth of semiconductors, including new mask materials and liquid-phase electroepitaxial growth on substrates coated by electrically conductive masks, are presented. New versions of the ELO technique from solution and from the vapor (growth from ridges and pendeo-epitaxy) are described and compared with standard ELO. A wide range of semiconductors, including III-V compounds grown from solution and vapor-grown GaN, are used to illustrate phenomena discussed. Very often, the similar behavior of various ELO structures reveals that the phenomena presented are not related to a specific group of compounds or their growth techniques, but have a much more general nature.

  12. Comparison of trimethylgallium and triethylgallium as “Ga” source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma-assisted atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Alevli, Mustafa, E-mail: mustafaalevli@marmara.edu.tr [Department of Physics, Marmara University, Göztepe Kadıköy, 34722 İstanbul (Turkey); Haider, Ali; Kizir, Seda; Leghari, Shahid A.; Biyikli, Necmi, E-mail: biyikli@unam.bilkent.edu.tr [Institute of Materials Science and Nanotechnology, Bilkent University, Bilkent, 06800 Ankara, Turkey and National Nanotechnology Research Center (UNAM), Bilkent University, Bilkent, 06800 Ankara (Turkey)

    2016-01-15

    GaN films grown by hollow cathode plasma-assisted atomic layer deposition using trimethylgallium (TMG) and triethylgallium (TEG) as gallium precursors are compared. Optimized and saturated TMG/TEG pulse widths were used in order to study the effect of group-III precursors. The films were characterized by grazing incidence x-ray diffraction, atomic force microscopy, x-ray photoelectron spectroscopy, and spectroscopic ellipsometry. Refractive index follows the same trend of crystalline quality, mean grain, and crystallite sizes. GaN layers grown using TMG precursor exhibited improved structural and optical properties when compared to GaN films grown with TEG precursor.

  13. Metal organic vapor phase epitaxy growth of (Al)GaN heterostructures on SiC/Si(111) templates synthesized by topochemical method of atoms substitution

    DEFF Research Database (Denmark)

    Rozhavskaya, Mariia M.; Kukushkin, Sergey A.; Osipov, Andrey V.

    2017-01-01

    crystalline interfaces with epitaxial relationship between SiC/Si and AlN/SiC layers. Optimization of SiC morphology and AlN seed layer thickness facilitates the growth of GaN layers free of pits (v-defects). It is also found that Si doping eliminates these defects in the case of growth on SiC templates...... with non-optimized surface morphology. Thus, synthesis of thin SiC buffer layer is suggested as a solution for the interface problems at the initial stage of III-N on Si epitaxy....

  14. Layer-Controlled Chemical Vapor Deposition Growth of MoS2 Vertical Heterostructures via van der Waals Epitaxy.

    Science.gov (United States)

    Samad, Leith; Bladow, Sage M; Ding, Qi; Zhuo, Junqiao; Jacobberger, Robert M; Arnold, Michael S; Jin, Song

    2016-07-26

    The fascinating semiconducting and optical properties of monolayer and few-layer transition metal dichalcogenides, as exemplified by MoS2, have made them promising candidates for optoelectronic applications. Controllable growth of heterostructures based on these layered materials is critical for their successful device applications. Here, we report a direct low temperature chemical vapor deposition (CVD) synthesis of MoS2 monolayer/multilayer vertical heterostructures with layer-controlled growth on a variety of layered materials (SnS2, TaS2, and graphene) via van der Waals epitaxy. Through precise control of the partial pressures of the MoCl5 and elemental sulfur precursors, reaction temperatures, and careful tracking of the ambient humidity, we have successfully and reproducibly grown MoS2 vertical heterostructures from 1 to 6 layers over a large area. The monolayer MoS2 heterostructure was verified using cross-sectional high resolution transmission electron microscopy (HRTEM) while Raman and photoluminescence spectroscopy confirmed the layer-controlled MoS2 growth and heterostructure electronic interactions. Raman, photoluminescence, and energy dispersive X-ray spectroscopy (EDS) mappings verified the uniform coverage of the MoS2 layers. This reaction provides an ideal method for the scalable layer-controlled growth of transition metal dichalcogenide heterostructures via van der Waals epitaxy for a variety of optoelectronic applications.

  15. GaN and ZnO nanostructures

    Energy Technology Data Exchange (ETDEWEB)

    Fuendling, Soenke; Soekmen, Uensal; Behrends, Arne; Al-Suleiman, Mohamed Aid Mansur; Merzsch, Stephan; Li, Shunfeng; Bakin, Andrey; Wehmann, Hergo-Heinrich; Waag, Andreas [Institut fuer Halbleitertechnik, Technische Universitaet Braunschweig, Braunschweig (Germany); Laehnemann, Jonas; Jahn, Uwe; Trampert, Achim; Riechert, Henning [Paul-Drude-Institut fuer Festkoerperelektronik, Berlin (Germany)

    2010-10-15

    GaN and ZnO are both wide band gap semiconductors with interesting properties concerning optoelectronic and sensor device applications. Due to the lack or the high costs of native substrates, alternatives like sapphire, silicon, or silicon carbide are taken, but the resulting lattice and thermal mismatches lead to increased defect densities which reduce the material quality. In contrast, nanostructures with high aspect ratio have lower defect densities as compared to layers. In this work, we give an overview on our results achieved on both ZnO as well as GaN based nanorods. ZnO nanostructures were grown by a wet chemical approach as well as by VPT on different substrates - even on flexible polymers. To compare the growth results we analyzed the structures by XRD and PL and show possible device applications. The GaN nano- and microstructures were grown by metal organic vapor phase epitaxy either in a self-organized process or by selective area growth for a better control of shape and material composition. Finally we take a look onto possible device applications, presenting our attempts, e.g., to build LEDs based on GaN nanostructures. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  16. Wafer-scale controlled exfoliation of metal organic vapor phase epitaxy grown InGaN/GaN multi quantum well structures using low-tack two-dimensional layered h-BN

    Energy Technology Data Exchange (ETDEWEB)

    Ayari, Taha; Li, Xin; Voss, Paul L.; Ougazzaden, Abdallah, E-mail: aougazza@georgiatech-metz.fr [School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States); Georgia Tech Lorraine, UMI 2958, Georgia Tech-CNRS, 57070 Metz (France); Sundaram, Suresh; El Gmili, Youssef [Georgia Tech Lorraine, UMI 2958, Georgia Tech-CNRS, 57070 Metz (France); Salvestrini, Jean Paul [Georgia Tech Lorraine, UMI 2958, Georgia Tech-CNRS, 57070 Metz (France); Université de Lorraine, LMOPS, EA 4423, 57070 Metz (France)

    2016-04-25

    Recent advances in epitaxial growth have led to the growth of III-nitride devices on 2D layered h-BN. This advance has the potential for wafer-scale transfer to arbitrary substrates, which could improve the thermal management and would allow III-N devices to be used more flexibly in a broader range of applications. We report wafer scale exfoliation of a metal organic vapor phase epitaxy grown InGaN/GaN Multi Quantum Well (MQW) structure from a 5 nm thick h-BN layer that was grown on a 2-inch sapphire substrate. The weak van der Waals bonds between h-BN atomic layers break easily, allowing the MQW structure to be mechanically lifted off from the sapphire substrate using a commercial adhesive tape. This results in the surface roughness of only 1.14 nm on the separated surface. Structural characterizations performed before and after the lift-off confirm the conservation of structural properties after lift-off. Cathodoluminescence at 454 nm was present before lift-off and 458 nm was present after. Electroluminescence near 450 nm from the lifted-off structure has also been observed. These results show that the high crystalline quality ultrathin h-BN serves as an effective sacrificial layer—it maintains performance, while also reducing the GaN buffer thickness and temperature ramps as compared to a conventional two-step growth method. These results support the use of h-BN as a low-tack sacrificial underlying layer for GaN-based device structures and demonstrate the feasibility of large area lift-off and transfer to any template, which is important for industrial scale production.

  17. Roles of lightly doped carbon in the drift layers of vertical n-GaN Schottky diode structures on freestanding GaN substrates

    Science.gov (United States)

    Tanaka, Takeshi; Kaneda, Naoki; Mishima, Tomoyoshi; Kihara, Yuhei; Aoki, Toshichika; Shiojima, Kenji

    2015-04-01

    We studied the roles of lightly doped carbon in a series of n-GaN Schottky diode epitaxial structures on freestanding GaN substrates, and evaluated the effects of the doping on diode performances. A large variation of compensation ratio was observed for carbon doping at (1-2) × 1016 cm-3. A model was proposed to explain this phenomenon, in which a vulnerable balance between donor-type CGa and deep acceptor CN strongly affected the free-carrier generation. Application of Norde plots and reverse biased leakage current in current-voltage measurements suggested provisional optimization for a free-carrier concentration of 8 × 1015 cm-3 to achieve a tradeoff between breakdown voltage and on-resistance of the n-GaN diodes.

  18. SYNTHESIS OF THICK GALLIUM NITRIDE LAYERS BY METHOD OF MULTI-STAGE GROWTH ON SUBSTRATES WITH COLUMN STRUCTURE

    Directory of Open Access Journals (Sweden)

    Marina G. Mynbaeva

    2016-11-01

    Full Text Available Subject of Research.The paper deals with processes of formation and transformation of defects during multi-stage growth of thick gallium nitride layers with hydride vapor phase epitaxy on GaN/Al2O3 substrates with buried column pattern formed with the use of metal-organic vapor phase epitaxy. Methods. The growth of initial GaN layers was performed with the use of metal-organic vapor phase epitaxy. On the surface of the initial layers columns with the height of 800 nm were generated by means of ion etching. These columns were overgrown with 3-4 µm-thick GaN layers. On thus formed substrate multi-stage growth of GaN layers was performed with the use of hydride vapor-phase epitaxy. The total thickness of GaN layers was 100-1500 µm. The grown layers were studied by optical and electron microscopy and Raman spectroscopy. Main Results. Density of threading dislocations in the layers grown by hydride vapor-phase epitaxy was (3-6·107 cm-2, that was one order of magnitude lower than in the used substrate, and two to three orders lower than dislocation density in typical GaN layers grown on commercial sapphire substrates. Raman spectroscopy data were indicative of low level of mechanical stress in the layers and their high structural uniformity. It was established that under multi-stage growth conditions, non-catastrophic cracks (those that do not cause sample destruction are able to transform into macropores and appear to be an important structural element, serving to stress relaxation in the bulk of thick gallium nitride layers grown on foreign substrates. Practical Relevance. The results of the study can be used in the development of III-nitride heterostructures for optoelectronics and high-power and high-frequency microelectronics.

  19. In-situ potential mapping of space charge layer in GaN nanowires under electrical field by off-axis electron holography

    Directory of Open Access Journals (Sweden)

    Xiao Chen

    2016-04-01

    Full Text Available In situ potential mapping of space charge (SC layer in a single GaN nanowire (NW contacted to the Au metal electrode has been conducted using off-axis electron holography in order to study the space distribution of SC layer under electric biases. Based on the phase image reconstructed from the complex hologram the electrostatic potential at the SC layer was clearly revealed; the SC width was estimated to be about 76 nm under zero bias condition. In order to study dynamic interrelation between the SC layer and bias conditions, the variation of the electrostatic potential due to change of the SC widths respond to the different bias conditions have also been examined. The measured SC layers are found to vary between 68 nm and 91 nm, which correspond to the saturated SC layers at the GaN-Au contact under the forward and reverse bias conditions, respectively. By plotting the square widths of the SC layer against the applied voltages, donor density of GaN NWs was derived to be about 4.3*106 cm−3. Our experiments demonstrate that in-situ electron holography under electric field can be a useful method to investigate SC layers and donor density in single NW and other heterostructures.

  20. Thermodynamic analysis of the deposition of GaAs epitaxial layers prepared by the MOCVD method

    Energy Technology Data Exchange (ETDEWEB)

    Leitner, J.; Mikulec, J. (Dept. of Materials for Electronics, Prague Inst. of Chemical Tech. (Czechoslovakia)); Vonka, P. (Dept. of Physical Chemistry, Prague Inst. of Chemical Tech. (Czechoslovakia)); Stejskal, J.; Hladina, R.; Klima, P. (TESLA Research Inst. of Radiocommunication, Prague (Czechoslovakia))

    1991-06-01

    On the basis of a detailed thermodynamic analysis of the Ga-As-C-H system, the initial conditions have been determined, under which the reaction of trimethylgallium (TMGa) and arsine in a hydrogen atmosphere produces a single condensed phase - solid GaAs. Liquid gallium with a small amount of dissolved arsenic is formed simultaneously when the initial ratio of the elements is B{sup V}/A{sup III}<1, whereas solid graphite is simultaneously deposited at a high initial concentration of TMGa, especially at an elevated temperature and a decreased pressure. The equilibrium concentrations of the gaseous substances are strongly influenced by the initial B{sup V}/A{sup III} ratio. As{sub 2}, As{sub 4}, and CH{sub 4} are the dominant species if B{sup V}/A{sup III}>1, while CH{sub 4}, GaCH{sub 3}, GaH and GaH{sub 2} are the most abundant if B{sup V}/A{sup III} < 1. The calculated deposition diagrams are in good qualitative agreement with experimental results published in the literature. A comparison of the calculated composition of the gaseous phase and the results of experiments under the conditions used for the deposition of GaAs epitaxial layers leads to the conclusion that the course and results of the deposition process are significantly affected by transport and kinetic phenomena. (orig.).

  1. Epitaxial NbN/AlN/NbN tunnel junctions on Si substrates with TiN buffer layers

    Energy Technology Data Exchange (ETDEWEB)

    Sun, Rui [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology (SIMIT), Chinese Academy of Sciences (CAS), Shanghai 200050 (China); University of Chinese Academy of Sciences, Beijing 100049 (China); Makise, Kazumasa; Terai, Hirotaka [Advanced ICT Research Institute, National Institute of Information and Communications Technology (Japan); Zhang, Lu [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology (SIMIT), Chinese Academy of Sciences (CAS), Shanghai 200050 (China); Wang, Zhen, E-mail: zwang@mail.sim.ac.cn [State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology (SIMIT), Chinese Academy of Sciences (CAS), Shanghai 200050 (China); University of Chinese Academy of Sciences, Beijing 100049 (China); Shanghai Tech University, Shanghai 201210 (China)

    2016-06-15

    We have developed epitaxial NbN/AlN/NbN tunnel junctions on Si (100) substrates with a TiN buffer layer. A 50-nm-thick (200)-oriented TiN thin film was introduced as the buffer layer for epitaxial growth of NbN/AlN/NbN trilayers on Si substrates. The fabricated NbN/AlN/NbN junctions demonstrated excellent tunneling properties with a high gap voltage of 5.5 mV, a large I{sub c}R{sub N} product of 3.8 mV, a sharp quasiparticle current rise with a ΔV{sub g} of 0.4 mV, and a small subgap leakage current. The junction quality factor R{sub sg}/R{sub N} was about 23 for the junction with a J{sub c} of 47 A/cm{sup 2} and was about 6 for the junction with a J{sub c} of 3.0 kA/cm{sup 2}. X-ray diffraction and transmission electron microscopy observations showed that the NbN/AlN/NbN trilayers were grown epitaxially on the (200)-orientated TiN buffer layer and had a highly crystalline structure with the (200) orientation.

  2. Epitaxial NbN/AlN/NbN tunnel junctions on Si substrates with TiN buffer layers

    Directory of Open Access Journals (Sweden)

    Rui Sun

    2016-06-01

    Full Text Available We have developed epitaxial NbN/AlN/NbN tunnel junctions on Si (100 substrates with a TiN buffer layer. A 50-nm-thick (200-oriented TiN thin film was introduced as the buffer layer for epitaxial growth of NbN/AlN/NbN trilayers on Si substrates. The fabricated NbN/AlN/NbN junctions demonstrated excellent tunneling properties with a high gap voltage of 5.5 mV, a large IcRN product of 3.8 mV, a sharp quasiparticle current rise with a ΔVg of 0.4 mV, and a small subgap leakage current. The junction quality factor Rsg/RN was about 23 for the junction with a Jc of 47 A/cm2 and was about 6 for the junction with a Jc of 3.0 kA/cm2. X-ray diffraction and transmission electron microscopy observations showed that the NbN/AlN/NbN trilayers were grown epitaxially on the (200-orientated TiN buffer layer and had a highly crystalline structure with the (200 orientation.

  3. Vertically aligned GaAs nanowires on graphite and few-layer graphene: generic model and epitaxial growth.

    Science.gov (United States)

    Munshi, A Mazid; Dheeraj, Dasa L; Fauske, Vidar T; Kim, Dong-Chul; van Helvoort, Antonius T J; Fimland, Bjørn-Ove; Weman, Helge

    2012-09-12

    By utilizing the reduced contact area of nanowires, we show that epitaxial growth of a broad range of semiconductors on graphene can in principle be achieved. A generic atomic model is presented which describes the epitaxial growth configurations applicable to all conventional semiconductor materials. The model is experimentally verified by demonstrating the growth of vertically aligned GaAs nanowires on graphite and few-layer graphene by the self-catalyzed vapor-liquid-solid technique using molecular beam epitaxy. A two-temperature growth strategy was used to increase the nanowire density. Due to the self-catalyzed growth technique used, the nanowires were found to have a regular hexagonal cross-sectional shape, and are uniform in length and diameter. Electron microscopy studies reveal an epitaxial relationship of the grown nanowires with the underlying graphitic substrates. Two relative orientations of the nanowire side-facets were observed, which is well explained by the proposed atomic model. A prototype of a single GaAs nanowire photodetector demonstrates a high-quality material. With GaAs being a model system, as well as a very useful material for various optoelectronic applications, we anticipate this particular GaAs nanowire/graphene hybrid to be promising for flexible and low-cost solar cells.

  4. GaN-Si direct wafer bonding at room temperature for thin GaN device transfer after epitaxial lift off

    Science.gov (United States)

    Mu, Fengwen; Morino, Yuki; Jerchel, Kathleen; Fujino, Masahisa; Suga, Tadatomo

    2017-09-01

    Room temperature GaN-Si direct wafer bonding was done by surface activated bonding (SAB). At first, a feasibility study using GaN template has been done. Then, crystal-face dependence of the bonding results for freestanding GaN substrate has been investigated between Ga-face and N-face. The results of Ga-face to Si bonding are better than that of N-face to Si bonding such as higher bonding energy and larger bonded area. This difference should be caused by their different surface roughnesses after chemical-mechanical polishing (CMP). Besides, both of the structure and composition of the two kinds of interfaces were investigated to understand the bonding mechanisms. The phenomenon of Ga-enrichment during surface activation and Ga-diffusion into Si at room temperature for both Ga-face bonding and N-face bonding has been confirmed.

  5. Photoluminescence studies of GaN films on Si(111) substrate by using an AlN buffer control

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Doek Kyu; Park, Choon Bae [Wonkwang University, Iksan (Korea, Republic of)

    2005-12-15

    The optical properties of GaN epitaxial layers grown on silicon (111) substrates with AlN buffer layers by using metalorganic vapor phase epitaxy were investigated for various values of the buffer layer's thickness. As the AlN thickness increased, the peak position of the free exciton of the GaN films was red-shifted linearly and the full width at half maximum (FWHM) of the free-exciton peak decreased. The red-shift of the free-exciton peak was attributed to cracks due to heavy stress. In 80-nm-thick AlN, the strong band-edge emission of GaN on Si (111) was observed with the full width at half maximum of the bound exciton line being as low as 17 mev at 13 K. The variations of Varshni's fitting parameter and the activation energy of the free exciton with the AlN thickness were evaluated for GaN films

  6. Photo-irradiation effects on GaAs atomic layer epitaxial growth. GaAs no genshiso epitaxial seicho ni okeru hikari reiki koka

    Energy Technology Data Exchange (ETDEWEB)

    Mashita, M.; Kawakyu, Y.; Sasaki, M.; Ishikawa, H. (Toshiba Corp., Kawasaki (Japan). Research and Development Center)

    1990-08-10

    Single atomic layer epitaxy (ALE) aims at controlling a growing film at a precision of single molecular layer. In this article, it is reported that the growth temperature range of ALE was expanded by the vertical irradiation of KrF exima laser (248 nm) onto the substrate for the ALE growth of GaAs using the metalorganic chemical vapor deposition (MOCVD) method. Thanks for the results of the above experiment, it was demonstrated that the irradiation effect was not thermal, but photochemical. In addition, this article studies the possibility of adsorption layer irradiation and surface irradiation as the photo-irradiation mechanism, and points out that coexistence of both irradiation mechanisms can be considered and, in case of exima laser, strong possibility of direct irradiation of the adsorption layer because of its high power density. Hereinafter, by using both optical growth ALE and thermal growth ALE jointly, the degree of freedom of combination of hetero ALE increases and its application to various material systems becomes possible. 16 refs., 6 figs.

  7. GaN Based Structures for NEA by MBE and Investigation of Nitrogen Species and Precursors for Optimum Layer Properties

    National Research Council Canada - National Science Library

    Morkoc, Hadis

    1997-01-01

    ... (GaN which are stable at 500 deg C, Pt Schottky barriers with nearly a unity ideality factor which appear stable at operation temperatures of about 500 deg C, AlGaN/GaN MODFETs on sapphire substrates...

  8. Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition

    Energy Technology Data Exchange (ETDEWEB)

    Alevli, Mustafa, E-mail: mustafaalevli@marmara.edu.tr; Gungor, Neşe [Department of Physics, Faculty of Arts and Sciences, Marmara University, Goztepe, 34722 Istanbul (Turkey); Haider, Ali; Kizir, Seda; Leghari, Shahid A.; Biyikli, Necmi, E-mail: biyikli@unam.bilkent.edu.tr [Institute of Materials Science and Nanotechnology, Bilkent University, Bilkent, 06800 Ankara, Turkey and National Nanotechnology Research Center (UNAM), Bilkent University, Bilkent, 06800 Ankara (Turkey)

    2016-01-15

    Gallium nitride films were grown by hollow cathode plasma-assisted atomic layer deposition using triethylgallium and N{sub 2}/H{sub 2} plasma. An optimized recipe for GaN film was developed, and the effect of substrate temperature was studied in both self-limiting growth window and thermal decomposition-limited growth region. With increased substrate temperature, film crystallinity improved, and the optical band edge decreased from 3.60 to 3.52 eV. The refractive index and reflectivity in Reststrahlen band increased with the substrate temperature. Compressive strain is observed for both samples, and the surface roughness is observed to increase with the substrate temperature. Despite these temperature dependent material properties, the chemical composition, E{sub 1}(TO), phonon position, and crystalline phases present in the GaN film were relatively independent from growth temperature.

  9. High resolution alpha particle detection using 4H-SiC epitaxial layers: Fabrication, characterization, and noise analysis

    Science.gov (United States)

    Chaudhuri, Sandeep K.; Zavalla, Kelvin J.; Mandal, Krishna C.

    2013-11-01

    In this article we report the fabrication and characterization of large area, room-temperature operable and very high resolution Schottky barrier detectors for alpha particles using 20 μm thick n-type 4H-SiC epitaxial layers. Schottky barriers were fabricated by depositing circular nickel contacts of ~11 mm2 area on the 4H-SiC epitaxial layers. Room temperature current-voltage measurements revealed very high Schottky barrier height of 1.6 eV and extremely low leakage current of 3.5 pA at an operating reverse bias of -90 V. We also report an energy resolution of 0.29%, which is the best resolution obtained so far for uncollimated 5.48 MeV alpha particles in 4H-SiC epitaxial detectors with such a large area. Very low micropipe density (concentration (2.4×1014 cm-3) in the epilayer helped to achieve a high resolution even with the large detector area and a broad source. A diffusion length of ~18.6 μm for holes has been determined in these detectors following a calculation based on a drift-diffusion model. A noise analysis in terms of equivalent noise charge revealed that the white series noise due to the detector capacitance has substantial effect on their spectroscopic performance.

  10. Recent progress of high-quality GaN substrates by HVPE method

    Science.gov (United States)

    Fujikura, Hajime; Yoshida, Takehiro; Shibata, Masatomo; Otoki, Yohei

    2017-02-01

    Recent progress in our hydride vapor-phase epitaxy (HVPE) technique is discussed. First, the void-assisted separation (VAS)-method for freestanding GaN fabrication is introduced and its recent progress is described. When conventional HVPE conditions are used in the VAS method, the reduction in threading dislocation density (TDD) stops when growth exceeds a certain critical thickness. This limitation was overcome by controlling the crystal hardness by appropriate HVPE conditions, resulting in GaN bulk crystals with the highest nanoindentation hardness value reported to date (22 GPa). Based on this, the TDD had been markedly reduced to the mid-105/cm2 range. With regard to the fabrication of large wafers, a 4" GaN substrate was successfully fabricated by using the VAS method. The hardness control was also found to be beneficial for fabrication of 4" GaN substrates with small off-angle variations. Additionally, we succeeded in fabricating a 7" GaN substrate by using a newly developed tiling method. With respect to the material purity, extremely pure GaN crystals were grown by using a quartz-free HVPE system. All impurity concentrations measured by secondary-ion mass spectrometry, including those of Si, O, and C, were below the detection limit. The high-purity layers displayed an insulating nature in the absence of a dopant; by Si doping, the electron concentration could be controlled over a wide range, down to 1 × 1015/cm3, with a high mobility of over 1100 cm2/Vs. This indicates that HVPE has potential applications as a tool for the epitaxial growth of power-device structures.

  11. The roles of buffer layer thickness on the properties of the ZnO epitaxial films

    Energy Technology Data Exchange (ETDEWEB)

    Tang, Kun, E-mail: ktang@nju.edu.cn [Nanjing National Laboratory of Microstructures and School of Electronic Science and Engineering, Nanjing University, Nanjing 210023 (China); Huang, Shimin [Nanjing National Laboratory of Microstructures and School of Electronic Science and Engineering, Nanjing University, Nanjing 210023 (China); Gu, Shulin, E-mail: slgu@nju.edu.cn [Nanjing National Laboratory of Microstructures and School of Electronic Science and Engineering, Nanjing University, Nanjing 210023 (China); Zhu, Shunming [Nanjing National Laboratory of Microstructures and School of Electronic Science and Engineering, Nanjing University, Nanjing 210023 (China); Ye, Jiandong [Nanjing National Laboratory of Microstructures and School of Electronic Science and Engineering, Nanjing University, Nanjing 210023 (China); Nanjing University Institute of Optoelectronics at Yangzhou, Yangzhou 225009 (China); Xu, Zhonghua; Zheng, Youdou [Nanjing National Laboratory of Microstructures and School of Electronic Science and Engineering, Nanjing University, Nanjing 210023 (China)

    2016-12-01

    Highlights: • The growth mechanism has been revealed for the ZnO buffers with different thickness. • The surface morphology has been determined as the key factor to affect the epitaxial growth. • The relation between the hexagonal pits from buffers and epi-films has been established. • The hexagonal pits formed in the epi-films have been attributed to the V-shaped defects inheriting from the dislocations in the buffers. • The structural and electrical properties of the V-defects have been presented and analyzed. - Abstract: In this article, the authors have investigated the optimization of the buffer thickness for obtaining high-quality ZnO epi-films on sapphire substrates. The growth mechanism of the buffers with different thickness has been clearly revealed, including the initial nucleation and vertical growth, the subsequent lateral growth with small grain coalescence, and the final vertical growth along the existing larger grains. Overall, the quality of the buffer improves with increasing thickness except the deformed surface morphology. However, by a full-scale evaluation of the properties for the epi-layers, the quality of the epi-film is briefly determined by the surface morphology of the buffer, rather than the structural, optical, or electrical properties of it. The best quality epi-layer has been grown on the buffer with a smooth surface and well-coalescent grains. Meanwhile, due to the huge lattice mismatch between sapphire and ZnO, dislocations are inevitably formed during the growth of buffers. More importantly, as the film grows thicker, the dislocations may attracting other smaller dislocations and defects to reduce the total line energy and thus result in the formation of V-shape defects, which are connected with the bottom of the threading dislocations in the buffers. The V-defects appear as deep and large hexagonal pits from top view and they may act as electron traps which would affect the free carrier concentration of the epi-layers.

  12. Optical and structural investigations of pendeo-epitaxial AlGaN layers by spectrally resolved cathodoluminescence microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Schmidt, G.; Bastek, B.; Hempel, T.; Bertram, F.; Christen, J. [Institute of Experimental Physics, Otto-von-Guericke-University Magdeburg (Germany); Kueller, V.; Knauer, A.; Brunner, F.; Rodriguez, H.; Weyers, M.; Kneissl, M. [Ferdinand-Braun-Institut fuer Hoechstfrequenztechnik, Berlin (Germany)

    2010-07-01

    The ternary alloy AlGaN is a promising candidate for optoelectronic devices emitting in the deep UV. However, due to the large lattice and thermal mismatch, AlGaN layers grown on sapphire exhibit a high density of dislocations. In order to reduce this density AlGaN layers have been grown by pendeo-epitaxy. For this approach an AlN layer is directly grown on sapphire and subsequently patterned, resulting in a stripe structure parallel to [1010] with a trench width of 1.9 {mu}m and a ridge width of 1.1 {mu}m. The pattern was overgrown by a fully coalesced MOVPE AlGaN layer. We present the microscopic optical properties of the pendeo-epitaxial AlGaN layers. The spatially integrated cathodoluminescence (CL) spectrum exhibits two dominant peaks at 3.939 eV and 4.326 eV, respectively. Spatially resolved CL proved a correlation between the wavelength distribution and the trench pattern. The high energetic luminescence originates from the areas above the AlN ridges and the low energetic intensity from the area above the trenches, suggesting local different Al incorporation. Furthermore, the strain relaxation in growth direction is imaged by cross-sectional CL.

  13. Improvement in crystal quality and optical properties of n-type GaN employing nano-scale SiO2 patterned n-type GaN substrate.

    Science.gov (United States)

    Jo, Min Sung; Sadasivam, Karthikeyan Giri; Tawfik, Wael Z; Yang, Seung Bea; Lee, Jung Ju; Ha, Jun Seok; Moon, Young Boo; Ryu, Sang Wan; Lee, June Key

    2013-01-01

    n-type GaN epitaxial layers were regrown on the patterned n-type GaN substrate (PNS) with different size of silicon dioxide (SiO2) nano dots to improve the crystal quality and optical properties. PNS with SiO2 nano dots promotes epitaxial lateral overgrowth (ELOG) for defect reduction and also acts as a light scattering point. Transmission electron microscopy (TEM) analysis suggested that PNS with SiO2 nano dots have superior crystalline properties. Hall measurements indicated that incrementing values in electron mobility were clear indication of reduction in threading dislocation and it was confirmed by TEM analysis. Photoluminescence (PL) intensity was enhanced by 2.0 times and 3.1 times for 1-step and 2-step PNS, respectively.

  14. Optical polarization properties of m-plane AlxGa1-xN epitaxial films grown on m-plane freestanding GaN substrates toward nonpolar ultraviolet LEDs.

    Science.gov (United States)

    Hazu, Kouji; Chichibu, Shigefusa F

    2011-07-04

    Light polarization characteristics of the near-band-edge optical transitions in m-plane AlxGa1-xN epilayers suffering from anisotropic stresses are quantitatively explained. The epilayers were grown on an m-plane freestanding GaN substrate by both ammonia-source molecular beam epitaxy and metalorganic vapor phase epitaxy methods. The light polarization direction altered from E [symbol see text]c to E//c at the AlN mole fraction, x, between 0.25 and 0.32, where E is the electric field component of the light and [symbol see text] and // represent perpendicular and parallel, respectively. To give a quantitative explanation for the result, energies and oscillator strengths of the exciton transitions involving three separate valence bands are calculated as functions of strains using the Bir-Pikus Hamiltonian. The calculation predicts that the lowest energy transition (E1) is polarized to the m-axis normal to the surface (X3) for 0< x ≤ 1, meaning that E1 emission is principally undetectable from the surface normal for any in-plane tensile strained AlxGa1-xN. The polarization direction of observable surface emission is predicted to alter from c-axis normal (X1) to c-axis parallel (X2) for the middle energy transition (E2) and X2 to X1 for the highest energy transition (E3) between x = 0.25 and 0.32. The experimental results are consistently reproduced by the calculation.

  15. Self-assembled growth and structural analysis of inclined GaN nanorods on nanoimprinted m-sapphire using catalyst-free metal-organic chemical vapor deposition

    Directory of Open Access Journals (Sweden)

    Kyuseung Lee

    2016-04-01

    Full Text Available In this study, self-assembled inclined (1-10-3-oriented GaN nanorods (NRs were grown on nanoimprinted (10-10 m-sapphire substrates using catalyst-free metal-organic chemical vapor deposition. According to X-ray phi-scans, the inclined GaN NRs were tilted at an angle of ∼57.5° to the [10-10]sapp direction. Specifically, the GaN NRs grew in a single inclined direction to the [11-20]sapp. Uni-directionally inclined NRs were formed through the one-sided (10-11-faceted growth of the interfacial a-GaN plane layer. It was confirmed that a thin layer of a-GaN was formed on r-facet nanogrooves of the m-sapphire substrate by nitridation. The interfacial a-GaN nucleation affected both the inclined angle and the growth direction of the inclined GaN NRs. Using X-ray diffraction and selective area electron diffraction, the epitaxial relationship between the inclined (1-10-3 GaN NRs and interfacial a-GaN layer on m-sapphire substrates was systematically investigated. Moreover, the inclined GaN NRs were observed to be mostly free of stacking fault-related defects using high-resolution transmission electron microscopy.

  16. Pendeo-epitaxy of stress-free AlN layer on a profiled SiC/Si substrate

    Energy Technology Data Exchange (ETDEWEB)

    Bessolov, V.N. [Ioffe Physical Technical Institute, Russian Academy of Sciences, Politekhnicheskaya 26, St. Petersburg, 194021 (Russian Federation); Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, V.O., Bolshoj pr., 61, St. Petersburg, 199178 (Russian Federation); Karpov, D.V. [St. Petersburg Academic University - Nanotechnology Research and Education Centre of the Russian Academy of Sciences (Academic University), Khlopina 8/3, St Petersburg, 194021 (Russian Federation); University of Eastern Finland, P.O. Box 111, Joensuu, 80101 (Finland); Konenkova, E.V. [Ioffe Physical Technical Institute, Russian Academy of Sciences, Politekhnicheskaya 26, St. Petersburg, 194021 (Russian Federation); Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, V.O., Bolshoj pr., 61, St. Petersburg, 199178 (Russian Federation); Lipovskii, A.A. [St. Petersburg Academic University - Nanotechnology Research and Education Centre of the Russian Academy of Sciences (Academic University), Khlopina 8/3, St Petersburg, 194021 (Russian Federation); Peter the Great St. Petersburg Polytechnic University, Politekhnicheskaya 29, St. Petersburg, 195251 (Russian Federation); Osipov, A.V. [Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, V.O., Bolshoj pr., 61, St. Petersburg, 199178 (Russian Federation); St. Petersburg National Research University of Information Technologies, Mechanics and Optics, Kronverkskii pr. 49, St. Petersburg, 197101 (Russian Federation); Redkov, A.V. [Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, V.O., Bolshoj pr., 61, St. Petersburg, 199178 (Russian Federation); St. Petersburg Academic University - Nanotechnology Research and Education Centre of the Russian Academy of Sciences (Academic University), Khlopina 8/3, St Petersburg, 194021 (Russian Federation); Peter the Great St. Petersburg Polytechnic University, Politekhnicheskaya 29, St. Petersburg, 195251 (Russian Federation); and others

    2016-05-01

    A new approach to the pendeo-epitaxy of elastically-unstrained AlN films is developed. The AlN films are grown using chloride-hydride vapor phase epitaxy (HVPE) on a silicon substrate with specially synthesized and shaped buffer layer of nano-SiC (NSiC). This NSiC epitaxial layer is grown using a new technique based on the substitution of a part of silicon atoms by carbon ones in a 100–110 nm thick subsurface layer of the silicon substrate. The 2D array of ~ 200 nm in diameter wells with the depth of ~ 70 nm that is less than the NSiC layer thickness is formed on the NSiC surface using electron beam lithography followed by reactive ion etching, the period of the array is of 400 nm. In a single HVPE process we grew ~ 20 μm thick AlN film both on the shaped and smooth regions of the prepared substrate. The AlN films are examined with reflection high energy electron diffraction, X-ray diffractometry, Raman spectroscopy and scanning electron microscopy. We use the results of these measurements to compare residual elastic stresses in the AlN film grown on the shaped and smooth regions of the substrate. The film on the shaped part of the substrate is elastically-unstrained contrary to the smooth part where elastic stresses result in the formation of a textured AlN layer. The model of the AlN growth on shaped SiC/Si substrates prepared using the atomic substitution technique is proposed. - Highlights: • A new method for chloride-hydride vapor phase pendeo-epitaxy of AlN is proposed • Unstrained AlN layer is grown on a Si substrate with a nanoprofiled SiC buffer • SiC made by substitution of atoms is well suited for the growth of AlN • Dissolution of pores in silicon beneath the nano-SiC is revealed.

  17. Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Claudel, A., E-mail: arnaud.claudel@grenoble-inp.org [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Fellmann, V. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Science et Ingénierie des Matériaux et des Procédés, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Hères (France); Gélard, I. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Coudurier, N. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Science et Ingénierie des Matériaux et des Procédés, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Hères (France); Sauvage, D. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Balaji, M. [ACERDE, 354 Voie Magellan — Alpespace, 73800 Ste Hélène du Lac (France); Science et Ingénierie des Matériaux et des Procédés, Grenoble INP-CNRS-UJF, BP 75, 38402 Saint Martin d' Hères (France); Crystal Growth Center, Anna University, Chennai 600025 (India); and others

    2014-12-31

    Thin (0001) epitaxial aluminum nitride (AlN) layers were grown on c-plane sapphire using high temperature hydride vapor phase epitaxy. The experimental set-up consists of a vertical cold-wall quartz reactor working at low pressure in which the reactions take place on a susceptor heated by induction. The reactants used are ammonia and aluminum chlorides in situ formed via hydrogen chloride reaction with high purity aluminum pellets. As-grown AlN layers have been characterized by scanning electron microscopy, atomic force microscopy, X-ray diffraction, transmission electron microscopy, photoluminescence and Raman spectroscopies. The influence of the V/III ratio in the gas phase, from 1.5 to 15, on growth rate, surface morphology, roughness and crystalline quality is investigated in order to increase the quality of thin epitaxial AlN layers grown at high temperature. Typical growth rates of around 0.45 μm/h were obtained for such thin epitaxial AlN layers. The growth rate was unaffected by the V/III ratio. An optimum for roughness, crystalline quality and optical properties seems to exist at V/III = 7.5. As a matter of fact, for a V/III ratio of 7.5, best root mean square roughness and crystalline quality — measured on 0002 symmetric reflection — as low as 6.9 nm and 898 arcsec were obtained, respectively. - Highlights: • Growth of thin epitaxial AlN layers by high temperature hydride vapor phase epitaxy • Influence of V/III ratio on growth rate, morphology and crystalline quality • The effect of surface morphology on strain state and crystal quality is established.

  18. Effects of trimethylaluminium and tetrakis(ethylmethylamino) hafnium in the early stages of the atomic-layer-deposition of aluminum oxide and hafnium oxide on hydroxylated GaN nanoclusters.

    Science.gov (United States)

    León-Plata, Paola A; Coan, Mary R; Seminario, Jorge M

    2013-10-01

    We calculate the interactions of two atomic layer deposition (ALD) reactants, trimethylaluminium (TMA) and tetrakis(ethylmethylamino) hafnium (TEMAH) with the hydroxylated Ga-face of GaN clusters when aluminum oxide and hafnium oxide, respectively, are being deposited. The GaN clusters are suitable as testbeds for the actual Ga-face on practical GaN nanocrystals of importance not only in electronics but for several other applications in nanotechnology. We find that TMA spontaneously interacts with hydroxylated GaN; however it does not follow the atomic layer deposition reaction path unless there is an excess in potential energy introduced in the clusters at the beginning of the optimization, for instance, using larger bond lengths of various bonds in the initial structures. TEMAH also does not interact with hydroxylated GaN, unless there is an excess in potential energy. The formation of a Ga-N(CH3)(CH2CH3) bond during the ALD of HfO2 using TEMAH as the reactant without breaking the Hf-N bond could be the key part of the mechanism behind the formation of an interface layer at the HfO2/GaN interface.

  19. Ultra-smooth epitaxial Ge grown on Si(001) utilizing a thin C-doped Ge buffer layer

    KAUST Repository

    Mantey, J.

    2013-01-01

    Here, we present work on epitaxial Ge films grown on a thin buffer layer of C doped Ge (Ge:C). The growth rate of Ge:C is found to slow over time and is thus unsuitable for thick (>20 nm) layers. We demonstrate Ge films from 10 nm to >150 nm are possible by growing pure Ge on a thin Ge:C buffer. It is shown that this stack yields exceedingly low roughness levels (comparable to bulk Si wafers) and contains fewer defects and higher Hall mobility compared to traditional heteroepitaxial Ge. The addition of C at the interface helps reduce strain by its smaller atomic radius and its ability to pin defects within the thin buffer layer that do not thread to the top Ge layer. © 2013 AIP Publishing LLC.

  20. Cubic GaN Formation in Mn/GaN Multilayer Films on 6H-SiC(0001)

    Science.gov (United States)

    Cui, Y.; Lazarov, V.; Goetz, M.; Liu, H.; Robertson, D.; Gajdardziska-Josifovska, M.; Li, L.

    2003-03-01

    Group III nitrides have been extensively studied for their optical properties that are suitable for blue lasers. More recently the magnetic properties of transition metal doped GaN have attracted growing attentions because they may exhibit ferromagnetic order at room temperature. Using molecular beam epitaxy, we have grown GaN films delta-doped with Mn in a single layer, as well as in multiple layers. High-resolution transmission electron microscopy images of the cross section of these films were recorded and analyzed to measure the lattice structures, using digital diffractograms calculated by fast Fourier transform. We found that structure in the pre- and post-doping layers of both types of films match the hexagonal 2H-wurtzite GaN. Interestingly, the cubic zinc blende GaN phase was present in the films with multilayers of Mn delta doping. Both films have edge, mixed, and screw dislocations, as well as stacking faults and inversion domain boundaries, and their densities are drastically reduced within and beyond the doping regions. The implications of this study towards further research on Mn doping GaN will be discussed at the meeting.

  1. Anodic etching of GaN based film with a strong phase-separated InGaN/GaN layer: Mechanism and properties

    Energy Technology Data Exchange (ETDEWEB)

    Gao, Qingxue [School of Physics, Shandong University, Jinan, 250100 (China); Liu, Rong [Department of Fundamental Theories, Shandong Institute of Physical Education and Sports, Jinan 250063 (China); Xiao, Hongdi, E-mail: hdxiao@sdu.edu.cn [School of Physics, Shandong University, Jinan, 250100 (China); Cao, Dezhong; Liu, Jianqiang; Ma, Jin [School of Physics, Shandong University, Jinan, 250100 (China)

    2016-11-30

    Highlights: • GaN film with a strong phase-separated InGaN/GaN layer was etched by electrochemical etching. • Vertically aligned nanopores in n-GaN films were buried underneath the InGaN/GaN structures. • The relaxation of compressive stress in the MQW structure was found by PL and Raman spectra. - Abstract: A strong phase-separated InGaN/GaN layer, which consists of multiple quantum wells (MQW) and superlattices (SL) layers and can produce a blue wavelength spectrum, has been grown on n-GaN thin film, and then fabricated into nanoporous structures by electrochemical etching method in oxalic acid. Scanning electron microscopy (SEM) technique reveals that the etching voltage of 8 V leads to a vertically aligned nanoporous structure, whereas the films etched at 15 V show branching pores within the n-GaN layer. Due to the low doping concentration of barriers (GaN layers) in the InGaN/GaN layer, we observed a record-low rate of etching (<100 nm/min) and nanopores which are mainly originated from the V-pits in the phase-separated layer. In addition, there exists a horizontal nanoporous structure at the interface between the phase-separated layer and the n-GaN layer, presumably resulting from the high transition of electrons between the barrier and the well (InGaN layer) at the interface. As compared to the as-grown MQW structure, the etched MQW structure exhibits a photoluminescence (PL) enhancement with a partial relaxation of compressive stress due to the increased light-extracting surface area and light-guiding effect. Such a compressive stress relaxation can be further confirmed by Raman spectra.

  2. Vertical current-flow enhancement via fabrication of GaN nanorod p–n junction diode on graphene

    Energy Technology Data Exchange (ETDEWEB)

    Ryu, Sung Ryong [Quantum-functional Semiconductor Research Center, Dongguk University-Seoul, 100-715 (Korea, Republic of); Department of physics, Dongguk University, Seoul, 100-715 (Korea, Republic of); Ram, S.D. Gopal; Lee, Seung Joo; Cho, Hak-dong; Lee, Sejoon [Quantum-functional Semiconductor Research Center, Dongguk University-Seoul, 100-715 (Korea, Republic of); Kang, Tae Won, E-mail: twkang@dongguk.edu [Quantum-functional Semiconductor Research Center, Dongguk University-Seoul, 100-715 (Korea, Republic of); Clean Energy and Nano Convergence Centre, Hindustan University, Chennai 600 016 (India); Kwon, Sangwoo; Yang, Woochul [Department of physics, Dongguk University, Seoul, 100-715 (Korea, Republic of); Shin, Sunhye [Soft-Epi Inc., 240 Opo-ro, Opo-eup, Gwangju-si, Gyeonggi-do (Korea, Republic of); Woo, Yongdeuk [Department of Mechanical and Automotive Engineering, Woosuk University, Chonbuk 565-701 (Korea, Republic of)

    2015-08-30

    Highlights: • Uniaxial p–n junction diode in GaN nanorod is made by Hydride vapor phase epitaxy method. • The p–n junction diode property is clearly observed from the fabricated uniaxial p–n junction nanorod GaN nanorod. • Graphene is used as a current spreading layer to reduce the lateral resistance up to 700 times when compared with the commercial sapphire substrate, which is clearly explained with the aid of an equivalent circuit. • Kelvin Force Probe microscopy method is employed to visualize the p- and n- regions in a single GaN nanorod. - Abstract: Mg doped GaN nanorods were grown on undoped n-type GaN nanorods uniaxial on monolayer graphene by hydride vapor phase epitaxy (HVPE) method. The monolayer graphene used as the bottom electrode and a substrate as well provides good electrical contact, acts as a current spreading layer, well suitable for the growth of hexagonal GaN nanorod. In addition it has a work function suitable to that of n-GaN. The formed p–n nanorods show a Schottky behavior with a turn on voltage of 3 V. Using graphene as the substrate, the resistance of the nanorod is reduced by 700 times when compared with the case without using graphene as the current spreading layer. The low resistance of graphene acts in parallel with the resistance of the GaN buffer layer, and reduces the resistance drastically. The formed p–n junction in a single GaN nanorod is visualized by Kelvin Force Probe Microscopy (KPFM) to have distinctively contrast p and n regions. The measured contact potential difference of p-and n-region has a difference of 103 mV which well confirms the formed regions are electronically different. Low temperature photoluminescence (PL) spectra give evidence of dopant related acceptor bound emission at 3.2 eV different from 3.4 eV of undoped GaN. The crystalline structure, compositional purity is confirmed by X-ray diffraction (XRD), Transmission and Scanning electron microcopies (SEM), (TEM), Energy dispersive analysis

  3. SEM/EBIC investigations of extended defect system in GaN epilayers

    Energy Technology Data Exchange (ETDEWEB)

    Shmidt, N.M.; Sitnikova, A.A.; Zolotareva, R.V. [Ioffe Physico-Technical Institute, RAS, St. Petersburg (Russian Federation); Sirotkin, V.V.; Soltanovich, O.A.; Yakimov, E.B. [Institute of Microelectronics Technology, RAS, Chernogolovka (Russian Federation)

    2005-04-01

    The EBIC investigations of extended defect system in GaN epitaxial layers with different electron mobility and dislocation density have been carried out. The recombination strength and defect cylinder radius for threading dislocations have been estimated from their EBIC profiles. Some cellular structure is revealed in the samples with the less-ordered mosaic structure that could be associated with the enhanced recombination activity of domain boundaries in such layers. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  4. Ionic liquid gating on atomic layer deposition passivated GaN: Ultra-high electron density induced high drain current and low contact resistance

    Energy Technology Data Exchange (ETDEWEB)

    Zhou, Hong; Du, Yuchen; Ye, Peide D., E-mail: yep@purdue.edu [School of Electrical and Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907 (United States)

    2016-05-16

    Herein, we report on achieving ultra-high electron density (exceeding 10{sup 14 }cm{sup −2}) in a GaN bulk material device by ionic liquid gating, through the application of atomic layer deposition (ALD) of Al{sub 2}O{sub 3} to passivate the GaN surface. Output characteristics demonstrate a maximum drain current of 1.47 A/mm, the highest reported among all bulk GaN field-effect transistors, with an on/off ratio of 10{sup 5} at room temperature. An ultra-high electron density exceeding 10{sup 14 }cm{sup −2} accumulated at the surface is confirmed via Hall-effect measurement and transfer length measurement. In addition to the ultra-high electron density, we also observe a reduction of the contact resistance due to the narrowing of the Schottky barrier width on the contacts. Taking advantage of the ALD surface passivation and ionic liquid gating technique, this work provides a route to study the field-effect and carrier transport properties of conventional semiconductors in unprecedented ultra-high charge density regions.

  5. Single layers and multilayers of GaN and AlN in square-octagon structure: Stability, electronic properties, and functionalization

    Science.gov (United States)

    Gürbüz, E.; Cahangirov, S.; Durgun, E.; Ciraci, S.

    2017-11-01

    Further to planar single-layer hexagonal structures, GaN and AlN can also form free-standing, single-layer structures constructed from squares and octagons. We performed an extensive analysis of dynamical and thermal stability of these structures in terms of ab initio finite-temperature molecular dynamics and phonon calculations together with the analysis of Raman and infrared active modes. These single-layer square-octagon structures of GaN and AlN display directional mechanical properties and have wide, indirect fundamental band gaps, which are smaller than their hexagonal counterparts. These density functional theory band gaps, however, increase and become wider upon correction. Under uniaxial and biaxial tensile strain, the fundamental band gaps decrease and can be closed. The electronic and magnetic properties of these single-layer structures can be modified by adsorption of various adatoms, or by creating neutral cation-anion vacancies. The single-layer structures attain magnetic moment by selected adatoms and neutral vacancies. In particular, localized gap states are strongly dependent on the type of vacancy. The energetics, binding, and resulting electronic structure of bilayer, trilayer, and three-dimensional (3D) layered structures constructed by stacking the single layers are affected by vertical chemical bonds between adjacent layers. In addition to van der Waals interaction, these weak vertical bonds induce buckling in planar geometry and enhance their binding, leading to the formation of stable 3D layered structures. In this respect, these multilayers are intermediate between van der Waals solids and wurtzite crystals, offering a wide range of tunability.

  6. Epitaxial TiO 2/SnO 2 core-shell heterostructure by atomic layer deposition

    KAUST Repository

    Nie, Anmin

    2012-01-01

    Taking TiO 2/SnO 2 core-shell nanowires (NWs) as a model system, we systematically investigate the structure and the morphological evolution of this heterostructure synthesized by atomic layer deposition/epitaxy (ALD/ALE). All characterizations, by X-ray diffraction, high-resolution transmission electron microscopy, selected area electron diffraction and Raman spectra, reveal that single crystalline rutile TiO 2 shells can be epitaxially grown on SnO 2 NWs with an atomically sharp interface at low temperature (250 °C). The growth behavior of the TiO 2 shells highly depends on the surface orientations and the geometrical shape of the core SnO 2 NW cross-section. Atomically smooth surfaces are found for growth on the {110} surface. Rough surfaces develop on {100} surfaces due to (100) - (1 × 3) reconstruction, by introducing steps in the [010] direction as a continuation of {110} facets. Lattice mismatch induces superlattice structures in the TiO 2 shell and misfit dislocations along the interface. Conformal epitaxial growth has been observed for SnO 2 NW cores with an octagonal cross-section ({100} and {110} surfaces). However, for a rectangular core ({101} and {010} surfaces), the shell also derives an octagonal shape from the epitaxial growth, which was explained by a proposed model based on ALD kinetics. The surface steps and defects induced by the lattice mismatch likely lead to improved photoluminescence (PL) performance for the yellow emission. Compared to the pure SnO 2 NWs, the PL spectrum of the core-shell nanostructures exhibits a stronger emission peak, which suggests potential applications in optoelectronics. © The Royal Society of Chemistry 2012.

  7. Effect of stoichiometry on defect distribution in cubic GaN grown on GaAs by plasma-assisted MBE

    Energy Technology Data Exchange (ETDEWEB)

    Ruvimov, S.; Liliental-Weber, Z.; Washburn, J. [California Univ., Parlier, CA (United States). Kearney Agricultural Center; Drummond, T.J.; Hafish, M.; Lee, S.R. [Sandia National Labs., Albuquerque, NM (United States)

    1996-12-31

    High resolution electron microscopy was used to study the structure of {beta}-GaN epilayers grown on (001) GaAs substrates by plasma- assisted molecular-beam-epitaxy. The rf plasma source was used to promote chemically active nitrogen. The layer quality was shown to depend on growth conditions (Ga flux and N{sub 2} flow for fixed rf power). The best quality of GaN layers was achieved by ``stoichiometric`` growth; Ga-rich layers contain a certain amount of the wurtzite phase. GaN layers contain a high density of stacking faults which drastically decreases toward the GaN surface. Stacking faults are anisotropically distributed in the GaN layer; the majority intersect the interface along lines parallel to the ``major flat`` of the GaAs substrate. This correlates well with the observed anisotropy in the intensity distribution of x-ray reflexions. Formation of stacking faults are often associated with atomic steps at the GaN- GaAs interfaces.

  8. Electroburning of few-layer graphene flakes, epitaxial graphene, and turbostratic graphene discs in air and under vacuum

    OpenAIRE

    Andrea Candini; Nils Richter; Domenica Convertino; Camilla Coletti; Franck Balestro; Wolfgang Wernsdorfer; Mathias Kläui; Marco Affronte

    2015-01-01

    Graphene-based electrodes are very promising for molecular electronics and spintronics. Here we report a systematic characterization of the electroburning (EB) process, leading to the formation of nanometer-spaced gaps, on different types of few-layer graphene (namely mechanically exfoliated graphene on SiO2, graphene epitaxially grown on the C-face of SiC and turbostratic graphene discs deposited on SiO2) under air and vacuum conditions. The EB process is found to depend on both the graphene...

  9. Structural analysis of a phosphide-based epitaxial structure with a buried oxidized AlAs sacrificial layer

    Science.gov (United States)

    Englhard, M.; Reuters, B.; Baur, J.; Klemp, C.; Zaumseil, P.; Schroeder, T.; Skibitzki, O.

    2017-06-01

    Phosphide-based thin-film light-emitting diodes (TF-LEDs) lattice-matched to GaAs are well established in optoelectronics in the wavelength range between 550 and 650 nm. In this work, we investigate the impact of oxidized AlAs to overlying phosphide-based pseudomorphically grown epitaxial structures. Oxidation of a buried AlAs sacrificial layer allows the separation of the grown TF-LED epitaxy from its substrates and enables an oxidation lift-off process. To evaluate the strain effect of progressing oxidation on the structure of the chip, we perform high-resolution x-ray diffraction analysis on as-grown, mesa-structured, semi-oxidized, and completely laterally oxidized chips. At each state, a pseudomorphic phosphide-based InAlP layer is found. The InAlP layer exhibits a tensile out-of-plane strain of approximately 0.20% and a compressive in-plane strain of approx. -0.19%. Additionally, scanning transmission electron microscopy, energy-dispersive x-ray spectroscopy, and μ-photoluminescence were used for investigation of the boundary zone of the oxidation front of AlAs, the interfaces between phosphide-based semiconductors (InAlP/InGaAlP) and oxidized amorphous AlAs and the light emission of InGaAlP multiple quantum wells.

  10. Comparison of Epitaxial Growth Techniques for III-V Layer Structures

    Science.gov (United States)

    1992-05-22

    by OMVPE. Finally, every one of the epitaxial growth techniques described has found a nitch and is used for the production of a particular material...find its nitch in production. However, the versatility and capability for large scale production already demonstrated for OMVPE make it the favorite to

  11. Photovoltaic response of InGaN/GaN multi-quantum well solar cells enhanced by inserting thin GaN cap layers

    Energy Technology Data Exchange (ETDEWEB)

    Yang, J. [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, PO BOX 912, Beijing 100083 (China); Zhao, D.G., E-mail: dgzhao@red.semi.ac.cn [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, PO BOX 912, Beijing 100083 (China); Jiang, D.S.; Chen, P.; Zhu, J.J.; Liu, Z.S.; Le, L.C.; He, X.G.; Li, X.J. [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, PO BOX 912, Beijing 100083 (China); Yang, H. [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, PO BOX 912, Beijing 100083 (China); Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215123 (China); Zhang, Y.T.; Du, G.T. [State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130023 (China)

    2015-06-25

    Highlights: • The spectral response of InGaN/GaN MQW solar cells with different LT-cap layer thicknesses was investigated. • Inserting a 0.75 nm-thick LT-cap layer can remarkably improve photovoltaic response of InGaN/GaN MQW solar cells. • A macroscopic optical method was used to investigate the microscopic localization effect and defect density in InGaN QW. • Strong localization effect in InGaN QW is harmful for the formation of high efficiency InGaN/GaN MQW solar cells. - Abstract: Structural properties and photovoltaic response of InGaN/GaN multi-quantum well (MQW) solar cells with low temperature grown GaN cap (LT-cap) layers were investigated. It is found that inserting a thin LT-cap layer (around 0.75 nm) between each InGaN quantum well (QW) and GaN quantum barrier (QB) can remarkably improve photovoltaic response of InGaN/GaN MQW solar cells. This is attributed to the increased optical absorption of InGaN QWs due to higher indium content and thicker InGaN QWs thickness when LT-cap layers are added. However, if the LT-cap layer is too thick, the localization effect is enhanced and the defect density of InGaN QW layers will increase too much. Both of them will result in a reduced photovoltaic response of InGaN/GaN MQW solar cells.

  12. Texture and microstructure analysis of epitaxial oxide layers prepared on textured Ni-12wt%Cr tapes

    Energy Technology Data Exchange (ETDEWEB)

    Huehne, R; Kursumovic, A; Tomov, R I; Glowacki, B A [Department of Materials Science and IRC in Superconductivity, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ (United Kingdom); Holzapfel, B [Institut fuer Festkoerper- und Werkstoffforschung, Helmholtzstrasse 20, 01069 Dresden (Germany); Evetts, J E [Department of Materials Science and IRC in Superconductivity, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ (United Kingdom)

    2003-05-07

    Oxide layers for the preparation of YBa{sub 2}Cu{sub 3}O{sub 7-x} coated conductors were grown on highly textured Ni-12wt%Cr tapes in pure oxygen using surface oxidation epitaxy at temperatures between 1000 deg. C and 1300 deg. C. Microstructural investigations revealed a layered oxide structure. The upper layer consists mainly of dense cube textured NiO. This is followed by a porous layer containing NiO and NiCr{sub 2}O{sub 4} particles. A detailed texture analysis showed a cube-on-cube relationship of the NiCr{sub 2}O{sub 4} spinel to the metal substrate. Untextured Cr{sub 2}O{sub 3} particles in a nickel matrix were found in a third layer arising from internal oxidation of the alloy. A high surface roughness and mechanical instability of the oxide were observed, depending on oxidation temperature and film thickness. However, mechanically stable oxide layers have been prepared using an additional annealing step in a protective atmosphere. Additionally, mechanical polishing or a second buffer layer, which grows with a higher smoothness, may be applied to reduce the surface roughness for coated conductor applications.

  13. Layer-by-layer shuttered molecular-beam epitaxial growth of superconducting Sr{sub 1-x}La{sub x}CuO{sub 2} thin films

    Energy Technology Data Exchange (ETDEWEB)

    Maritato, L. [Dipartimento di Ingegneria dell' Informazione, Ingegneria Elettrica e Matematica Applicata-DIEM,University of Salerno and CNR-SPIN, 84084 Fisciano (Italy); Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 (United States); Galdi, A.; Orgiani, P. [Dipartimento di Ingegneria dell' Informazione, Ingegneria Elettrica e Matematica Applicata-DIEM, University of Salerno and CNR-SPIN, 84084 Fisciano (Italy); Harter, J. W. [Laboratory of Atomic and Solid State Physics, Department of Physics, Cornell University, Ithaca, New York 14853 (United States); Schubert, J. [Forschungszentrum Julich, Institute of Bio- and Nano-systems IBN, D-52425 Julich (Germany) and Forschungszentrum Julich, JARA Fundamentals of Future Information Technology, D-52425 Julich (Germany); Shen, K. M. [Laboratory of Atomic and Solid State Physics, Department of Physics, Cornell University, Ithaca, New York 14853 (United States); Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853 (United States); Schlom, D. G. [Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 (United States); Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853 (United States)

    2013-02-07

    Superconducting Sr{sub 1-x}La{sub x}CuO{sub 2} thin films have been grown on GdScO{sub 3} substrates by reflection high-energy electron diffraction calibrated layer-by-layer molecular-beam epitaxy. X-ray diffraction analysis has confirmed the infinite layer structure after an in situ vacuum annealing step. In situ photoemission spectroscopy indicates that the vacuum annealing step employed immediately after film growth to achieve superconducting films results in oxygen loss from the films. The superconducting critical temperature depends on the La content x, with the highest value obtained for x{approx}0.10. Resistivity as a function of temperature {rho}(T) curves of optimally doped samples show a T{sup 2} temperature dependence characteristic of a scattering process where electron-electron interactions dominate.

  14. Effect of TMBi supply on low-temperature MOVPE growth behavior of GaN

    Energy Technology Data Exchange (ETDEWEB)

    Saidi, C.; Chaaben, N.; Laifi, J.; Sekrafi, T. [Unité de Recherche sur les Hétéro-Epitaxies et Applications, Faculté des Sciences de Monastir, Avenue de l’Environnement, 5019 Monastir (Tunisia); Tottereau, O. [Centre de Recherche sur l’Hétéro-Epitaxie et Ses Applications, Centre National de la Recherche Scientifique, CRHEA-CNRS, Rue Bernard Grégory, F-06560 Valbonne, Sophia Antipolis (France); Bchetnia, A.; El Jani, B. [Unité de Recherche sur les Hétéro-Epitaxies et Applications, Faculté des Sciences de Monastir, Avenue de l’Environnement, 5019 Monastir (Tunisia)

    2015-03-15

    Highlights: • We examined the Bi doping effect on GaN layers properties, grown by LT-MOVPE. • No obvious dependence of growth rate with TMBi flow rate. • TMBi flow rate addition resulted in a reduction of reflectivity oscillation mean value. • We note the appearance of islands and columns containing Bi on layers surface. • While there is a decrease in surface roughness suggesting Bi surfactant effect. - Abstract: Undoped GaN and diluted GaNBi alloys were grown on (0 0 0 1) sapphire substrate by metal–organic vapor phase epitaxy (MOVPE) at 480 °C. By using in-situ laser reflectometry, it is found that the increase of TMBi flow rate leads to a reduction of the average value of reflectivity oscillations. Scanning electron microscopy (SEM) images gave a clear observation of the TMBi increasing amount effect on the surface morphology. The appearance of different structure (islands and columns) on GaN surface could be responsible to the reduction of the reflectivity oscillations average value. The energy dispersive X-ray (EDX) analysis showed that the observed structures were only composed of Bi compared to the flat GaN surface. Moreover, the surface morphology between islands and columns is improved when we increase the TMBi flow rate. This improvement is consistent with the decrease of root mean square (RMS) roughness, as measured by atomic force microscopy (AFM)

  15. MBE growth and properties of GaN on GaN/SiC substrates

    Science.gov (United States)

    Johnson, M. A. L.; Fujita, Shizuo; Rowland, W. H.; Bowers, K. A.; Hughes, W. C.; He, Y. W.; El Masry, N. A.; Cook, J. W.; Schetzina, J. F.; Ren, J.; Edmond, J. A.

    1997-02-01

    Growth of III-V nitrides by molecular beam epitaxy (MBE) is being studied at NCSU using an r.f. nitrogen plasma source. {GaN}/{SiC} substrates consisting of ˜ 3 μm thick GaN buffer layers grown on 6HSiC wafers by MOVPE at Cree Research Inc. are being used as substrates in the MBE film growth experiments. The MBE-grown GaN films exhibit excellent structural and optical properties—comparable to the best GaN films grown by MOVPE—as determined from photoluminescence, X-ray diffraction, and vertical-cross-section TEM micrographs. Mg and Si have been used as dopants for p-type and n-type layers, respectively. Al xGa 1 - xN films ( x ˜ 0.06-0.08) and {AlxGa1 - xN}/{GaN} multi-quantum-well structures have been grown which display good optical properties. Light-emitting diodes based on double-heterostructures of {AlxGa1 - xN}/{GaN} which emit violet light at ˜400 nm have also been demonstrated. Growth of GaN on LiGaO 2 substrates is also reported for comparison.

  16. Characterization of nonpolar a-plane GaN epi-layers grown on high-density patterned r-plane sapphire substrates

    Science.gov (United States)

    Jinno, Daiki; Otsuki, Shunya; Sugimori, Shogo; Daicho, Hisayoshi; Iwaya, Motoaki; Takeuchi, Tetsuya; Kamiyama, Satoshi; Akasaki, Isamu

    2018-02-01

    To reduce the number of threading dislocations (TDs) in nonpolar a-plane GaN (a-GaN) epi-layers grown on flat r-plane sapphire substrates (r-FSS), we investigated the effects on the crystalline quality of the a-GaN epi-layers of high-density patterned r-plane sapphire substrates (r-HPSS), the patterns of which were placed at intervals of several hundred nanometers. Two types of r-HPSS, the patterns of which had diameters and heights on the order of several hundred nanometers (r-NHPSS) or several micrometers (r-MHPSS), were prepared with conventional r-FSS. The effect of these r-HPSS on the a-GaN epi-layers was demonstrated by evaluating the surface morphology and the crystalline quality of the epi-layers. The surfaces of the a-GaN epi-layer grown on r-FSS and r-NHPSS were pit-free and mirror-like, whereas the surface of the a-GaN epi-layer grown on r-MHPSS was very rough due to the large, irregular GaN islands that grew on the patterns, mainly at the initial growth stage. The crystalline quality of the a-GaN epi-layer grown on r-NHPSS was better than that of the a-GaN epi-layer grown on r-FSS. We confirmed that there were fewer TDs in the a-GaN epi-layer grown on r-NHPSS than there were in the a-GaN epi-layer grown on r-FSS. The TDs propagating to the surface in a-GaN epi-layer grown on r-NHPSS were mainly generated on the flat sapphire regions between the patterns. Interestingly, it was also found that the TDs that propagated to the surface concentrated with a periodic pitch along the c-axis direction. The TD densities of a-GaN epi-layers grown on r-FSS and r-NHPSS were estimated to be approximately 5.0 × 1010 and 1.5 × 109 cm-2, respectively. This knowledge will contribute to the further development of a-GaN epi-layers for high-performance devices.

  17. Defect and dislocation structures in low-temperature-grown Ge and Ge{sub 1−x}Sn{sub x} epitaxial layers on Si(110) substrates

    Energy Technology Data Exchange (ETDEWEB)

    Kidowaki, Shohei [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Asano, Takanori [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Research Fellow of Japan Society for the Promotion of Science, 5-3-1, Kojimachi, Chiyoda-ku, Tokyo 102-0083 (Japan); Shimura, Yosuke [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Kurosawa, Masashi [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Taoka, Noriyuki [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Nakatsuka, Osamu, E-mail: nakatuka@alice.xtal.nagoya-u.ac.jp [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Zaima, Shigeaki [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)

    2016-01-01

    We have investigated the epitaxial growth and crystalline properties of Ge{sub 1−x}Sn{sub x} layers on a Si(110) substrate. We found that the twin growth in the Ge epitaxial layer deposited on the Si(110) using molecular beam epitaxy at a low temperature of 200 °C can be effectively suppressed by the incorporation of 2.0% Sn. We also examined the strain relaxation of annealed Ge{sub 1−x}Sn{sub x}/Si(110) samples. The degree of strain relaxation is enhanced by the annealing process, and the threading dislocation in the Ge{sub 1−x}Sn{sub x} layers decreases from 10{sup 11} cm{sup −2} to 10{sup 10} cm{sup −2} because of the propagation of misfit dislocations. We also observed misfit dislocations formed at the Ge{sub 1−x}Sn{sub x}/Si interface, which would effectively promote isotropic strain relaxation in the Ge{sub 1−x}Sn{sub x} layers. - Highlights: • Suppression of twin in GeSn growth on Si(110) substrate • Isotropic strain relaxation of Ge and GeSn layers by misfit dislocation network • Achievement of high quality GeSn epitaxial layers on Si(110) by post deposition annealing.

  18. Direct comparison of optical characteristics of InGaN-based laser diode structures grown on pendeo epitaxial GaN and sapphire substrates

    Science.gov (United States)

    Hwang, J. S.; Gokarna, A.; Cho, Yong-Hoon; Son, J. K.; Lee, S. N.; Sakong, T.; Paek, H. S.; Nam, O. H.; Park, Y.

    2007-03-01

    Direct comparison of optical properties and carrier dynamics of InGaN multiple quantum well (MQW) laser diode structures grown on pendeo epitaxial (PE)-GaN and sapphire substrates is reported. A strong increase in quantum efficiency and a dramatic reduction in stimulated emission threshold are observed for InGaN MQWs on PE-GaN substrates as compared to MQWs on sapphire substrates. Based on temperature-dependent time-resolved optical analysis, the authors find that a significant increase in nonradiative lifetime due to suppressed dislocation density plays an important role in enhancing optical properties of InGaN MQWs grown on PE-GaN substrates, resulting in radiative-process dominant emission even at room temperature.

  19. Magnetic and structural properties of Fe-implanted cubic GaN

    Science.gov (United States)

    Righetti, V. A. N.; Gratens, X.; Chitta, V. A.; de Godoy, M. P. F.; Rodrigues, A. D.; Abramof, E.; Dias, J. F.; Schikora, D.; As, D. J.; Lischka, K.

    2016-09-01

    In this article, we report on structural and magnetic properties of cubic GaN epitaxial layers implanted with Fe ions and subsequently subjected to thermal annealing. The epitaxial quality of the layers was studied by X-ray diffraction rocking curves (ω-scans) and Raman spectroscopy. The results show that the implantation damages the crystal structure producing an expansion of the lattice parameter in the implanted region. These damages are partially removed by the thermal treatment. Room temperature ferromagnetism is observed for the sample implanted with a dose of 1.2 × 1016 cm-2, while samples implanted with 2.4 × 1016 cm-2 show a coexistence of ferromagnetism and paramagnetism due to disperse Fe3+. Thermal annealing changes these magnetic properties. For the low dose sample, the ferromagnetism is converted into paramagnetism while for the high dose we observed an enhancement of the ferromagnetic contribution characterized by a superparamagnetism behavior attributed to Fe-based particles.

  20. Growth mechanism and structural characterization of hexagonal GaN films grown on cubic GaN (1 1 1)/GaAs (1 1 1)B substrates by MOVPE

    Science.gov (United States)

    Sanorpim, Sakuntam; Katayama, Ryuji; Yoodee, Kajornyod; Onabe, Kentaro

    2005-02-01

    Hexagonal phase GaN layers were grown by metalorganic vapor phase epitaxy (MOVPE) on GaAs (1 1 1)B substrates using the cubic phase GaN (c-GaN) as an intermediate layer. High-resolution X-ray diffraction (HRXRD) and transmission electron microscopy (TEM) measurements showed fairly good crystalline qualities of the h-GaN layers. Dislocation densities estimated from cross-sectional TEM micrographs were found to be as low as 10 7-10 8 cm -2. Flat growth of the c-GaN intermediate layer on GaAs (1 1 1)B substrate was achieved at a low-growth temperature (600 °C). The interface between the GaN layer and the GaAs (1 1 1)B substrate is very smooth without any voids, in spite of the high-growth temperatures of 880-960 °C. It is interesting that the lattice-matched h-GaN layer to the c-GaN intermediate layer can be obtained by controlling the cubic-to-hexagonal structural transition during the MOVPE growth process at appropriate growth temperatures. The growth mechanism and characteristics of the grown h-GaN layers are discussed.

  1. Effect of Sb in thick InGaAsSbN layers grown by liquid phase epitaxy

    Science.gov (United States)

    Donchev, V.; Milanova, M.; Asenova, I.; Shtinkov, N.; Alonso-Álvarez, D.; Mellor, A.; Karmakov, Y.; Georgiev, S.; Ekins-Daukes, N.

    2018-02-01

    Dilute nitride InGaAsSbN layers grown by low-temperature liquid phase epitaxy are studied in comparison with quaternary InGaAsN layers grown at the same growth conditions to understand the effect of Sb in the alloy. The lattice mismatch to the GaAs substrate is found to be slightly larger for the InGaAsSbN layers, which is explained by the large atomic radius of Sb. A reduction of the band gap energy with respect to InGaAsN is demonstrated by means of photoluminescence (PL), surface photovoltage (SPV) spectroscopy and tight-binding calculations. The band-gap energies determined from PL and ellipsometry measurements are in good agreement, while the SPV spectroscopy and the tight-binding calculations provide lower values. Possible reasons for these discrepancies are discussed. The PL spectra reveal localized electronic states in the band gap near the conduction band edge, which is confirmed by SPV spectroscopy. The analysis of the power dependence of the integrated PL has allowed determining the dominant radiative recombination mechanisms in the layers. The values of the refraction index in a wide spectral region are found to be higher for the Sb containing layers.

  2. Advantages of InGaN/GaN multiple quantum wells with two-step grown low temperature GaN cap layers

    Science.gov (United States)

    Zhu, Yadan; Lu, Taiping; Zhou, Xiaorun; Zhao, Guangzhou; Dong, Hailiang; Jia, Zhigang; Liu, Xuguang; Xu, Bingshe

    2017-11-01

    Two-step grown low temperature GaN cap layers (LT-cap) are employed to improve the optical and structural properties of InGaN/GaN multiple quantum wells (MQWs). The first LT-cap layer is grown in nitrogen atmosphere, while a small hydrogen flow is added to the carrier gas during the growth of the second LT-cap layer. High-resolution X-ray diffraction results indicate that the two-step growth method can improve the interface quality of MQWs. Room temperature photoluminescence (PL) tests show about two-fold enhancement in integrated PL intensity, only 25 meV blue-shift in peak energy and almost unchanged line width. On the basis of temperature-dependent PL characteristics analysis, it is concluded that the first and the second LT-cap layer play a different role during the growth of MQWs. The first LT-cap layer acts as a protective layer, which protects quantum well from serious indium loss and interface roughening resulting from the hydrogen over-etching. The hydrogen gas employed in the second LT-cap layer is in favor of reducing defect density and indium segregation. Consequently, interface/surface and optical properties are improved by adopting the two-step growth method.

  3. Photoluminescence and excitation spectroscopy of the 1.5 μm Er-related band in MBE-grown GaN layers

    Science.gov (United States)

    Izeddin, I.; Gregorkiewicz, T.; Lee, D. S.; Steckl, A. J.

    2004-10-01

    The infrared photoluminescence at 1.5 m due to the 4I 13/2→ 4I 15/2 transition of Er 3+ ions has been investigated for GaN:Er 3+ layers grown by MBE. Low temperature high resolution measurements performed under continuous illumination at the wavelength λ=532 nm, resonant to one of the intra-4f-shell transitions, revealed that the 1.5 μm band consists of up to eight individual spectral components. In excitation spectroscopy, a temperature dependence splitting of resonant bands was observed. On the basis of these experimental results, a possible multiplicity of optically active centers formed by Er doping in GaN layers is discussed.

  4. Growth of Atomic Hexagonal Boron Nitride Layers and Graphene/Hexagonal Boron Nitride Heterostructures by Molecular Beam Epitaxy

    Science.gov (United States)

    Xu, Zhongguang

    Graphene, as a famous Van der Waals material, has attracted intensive attention from research group and industry all over the world after 2004, while hexagonal boron nitride (h-BN), as an excellent two-dimensional (2D) dielectric layer, has been studied intensively mainly for its compatibility with graphene and other 2D materials. To realize the technological potential of 2D system, it is essential to synthesize large-area, high-quality 2D thin films through a scalable and controllable method in order to investigate novel phenomenon in fundamental physics and promising device applications. In this thesis, the growth of graphene, h-BN and their vertical and lateral heterostructures by molecular beam epitaxy (MBE) is mainly discussed. In addition, the growth mechanism, fundamental physics and possible applications are also studied. In-situ epitaxial growth of graphene/h-BN heterostructures on cobalt (Co) film substrate was achieved by using plasma-assisted MBE in Chapter 2. We demonstrated a solution for direct fabricating graphene/h-BN vertical stacking structures. Various characterizations, such as Raman spectroscopy, scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM), were carried out to confirm and evaluate the heterostructures. Wafer-scale heterostructures consisting of single-layer/bilayer graphene and multilayer h-BN were achieved. The mismatch angle between graphene and h-BN is below 1°. Chapter 3 studied the growth of graphene/h-BN heterostructures on Co foil substrate by plasma-assisted MBE. It is found that the coverage of h-BN layers on the epitaxial thin graphite layer is growth-time dependent. Large-area, uniform-quality h-BN film was successfully deposited on thin graphite layer. Based on the as-grown h-BN (5-6 nm)/G (26-27 nm) heterostructure, without using any transferring process, we fabricated capacitor devices with Co(foil)/G/h-BN/Co(contact) configuration to evaluate the

  5. High optical and structural quality of GaN epilayers grown on ( 2¯01) β-Ga2O3

    KAUST Repository

    Mumthaz Muhammed, Mufasila

    2014-07-28

    Producing highly efficient GaN-based optoelectronic devices has been a challenge for a long time due to the large lattice mismatch between III-nitride materials and the most common substrates, which causes a high density of threading dislocations. Therefore, it is essential to obtain alternative substrates with small lattice mismatches, appropriate structural, thermal and electrical properties, and a competitive price. Our results show that (2̄01) oriented β-Ga2O3 has the potential to be used as a transparent and conductive substrate for GaN-growth. Photoluminescence spectra of thick GaN layers grown on (2̄01) oriented β-Ga 2O3 are found to be dominated by intense bandedge emission. Atomic force microscopy studies show a modest threading dislocation density of ∼108cm-2. X-ray diffraction studies show the high quality of the single-phase wurtzite GaN thin film on (2̄01) β-Ga2O3 with in-plane epitaxial orientation relationships between the β-Ga2O3 and the GaN thin film defined by (010) β-Ga2O3 || (112̄0) GaN and (2̄01) β-Ga2O3 || (0001) GaN leading to a lattice mismatch of ∼4.7%. Complementary Raman spectroscopy indicates that the quality of the GaN epilayer is high. © 2014 AIP Publishing LLC.

  6. Epitaxial growth of superconducting MgB2 thin films with a Mg buffer layer at 110 °C

    Science.gov (United States)

    Shishido, Hiroaki; Nakagami, Takatoshi; Yoshida, Takuya; Ishida, Takekazu

    2017-07-01

    Since the discovery of MgB2, its application to superconducting electronics has been limited by the absent of proper microfabrication techniques. In this study, we grew crystalline MgB2 thin films using molecular beam epitaxy at a low substrate temperature of 110 °C under ultra-high vacuum of about 10-6 Pa. MgB2 thin films were deposited with an epitaxial Mg buffer layer on c-plane 4H-SiC or sapphire substrates. In spite of the low growth temperature, superior crystallinity and surface flatness were confirmed by in situ reflection high-energy electron diffraction and X-ray diffraction measurements. Moreover, we successfully confirmed the occurrence of a sharp superconducting transition at 27 K. The present growth temperature was lower than any in prior reports on superconducting MgB2 thin films, and is lower than the applicable temperature of an organic-based lift-off resist. Our new MgB2 thin film growth process is promising for the development of an alternative nanofabrication technique for MgB2 thin films by means of a standard lift-off process with an organic resist.

  7. Epitaxial AlN layers on sapphire and diamond; Epitaktische AlN-Schichten auf Saphir und Diamant

    Energy Technology Data Exchange (ETDEWEB)

    Hermann, Martin

    2009-04-27

    In this work, epitaxial AlN layers deposited by molecular beam epitaxy on sapphire and diamond substrates were investigated. Starting from this AlN, the dopant silicon was added. The influence of the silicon doping on the structural properties of the host AlN crystal was investigated using high resolution X-ray diffraction. Once the silicon concentration exceeds 1 x 10{sup 19} cm{sup -3}, a significant change of the AlN:Si crystal can be observed: increasing the silicon concentration up to 5 x 10{sup 20} cm{sup -3} results in a decrease of the a lattice parameter by approximately 1.2 pm and an increase of the c lattice parameter by about 1.0 pm. The crystal is stressed additionally by adding silicon resulting in a increase of the biaxial compressive stress of up to 2.0 GPa. Further increase of the silicon concentration leads to lattice relaxation. This result from X-ray diffraction was independently confirmed by Raman spectroscopy investigations. Further increase of the silicon concentration leads to the generation of polycrystalline phases within the epitaxial layer. XTEM measurements detected these polycrystalline phases. In addition, XTEM investigations confirmed also the increase of the lateral crystal size with increasing silicon concentration, as well as a great reduction of the screw dislocation density by more than one order of magnitude as found by X-ray diffraction: in undoped, nitrogen rich grown AlN layers the screw dislocation density is about 3 x 10{sup 8} cm{sup -2}, while AlN layers with a silicon concentration of 5 x 10{sup 20} cm{sup -3} show a screw dislocation density of only 1 x 10{sup 7} cm{sup -2}. In low-doped AlN:Si ([Si]{approx}2 x 10{sup 19} cm{sup -3}) the activation energy of the electronic conductivity is about 250 meV. Increasing the silicon concentration to about 1 x 10{sup 21} cm{sup -3} leads to an increase of the activation energy up to more than 500 meV in the now much more stressed AlN:Si epilayer. Studies of the absorption

  8. Raman scattering study of cubic GaN and GaMnN epilayers grown by plasma- assisted molecular beam epitaxy

    Science.gov (United States)

    Alarcón-Lladó, E.; Ibáñez, J.; Cuscó, R.; Artús, L.; Novikov, S. V.; Foxon, C. T.

    2009-11-01

    We perform visible and ultraviolet (UV) Raman-scattering experiments to study a series of undoped and Mn-doped c-GaN thin films grown by plasma-assisted molecular beam epitaxy under Ga-rich and N-rich conditions. The visible, non-resonant experiments confirm that the Ga-rich growth yields the improved crystal quality. New Raman features, most probably related to Mn-induced disorder, show up in the spectra of the c-GaMnN epilayers grown under N-rich conditions. We find that the introduction of an AlN buffer favors the growth of the hexagonal phase. In the UV spectra of the samples with better crystal quality, we detect multiphonon mA1(LO) peaks up to m = 4 together with strong PL signal from c-GaN. In the more disordered samples the PL emission is quenched, and this allows us to detect multiphonons up to m = 6. The intensity of the multiphonon peaks can be used to assess the crystal quality of the c-GaN and c-GaMnN samples.

  9. Effect of V/III ratio on the surface morphology and electrical properties of m-plane (10 1 bar 0) GaN homoepitaxial layers

    Science.gov (United States)

    Barry, Ousmane I.; Tanaka, Atsushi; Nagamatsu, Kentaro; Bae, Si-Young; Lekhal, Kaddour; Matsushita, Junya; Deki, Manato; Nitta, Shugo; Honda, Yoshio; Amano, Hiroshi

    2017-06-01

    We have investigated the effect of V/III ratio on the surface morphology, impurity concentration and electrical properties of m-plane (10 1 bar 0) Gallium Nitride (GaN) homoepitaxial layers. Four-sided pyramidal hillocks are observed on the nominally on-axis m-plane GaN films. Hillocks sizes relatively increase by increasing the V/III ratio. All facets of pyramidal hillocks exhibit well-defined step-terrace features. Secondary ion mass spectrometry depth profiles reveal that carbon impurities decrease by increasing the V/III ratio while the lowest oxygen content is found at an optimized V/III ratio of 900. Vertical Schottky barrier diodes fabricated on the m-GaN samples were characterized. Low leakage current densities of the order of 10-10 A/cm2 at -5 V are obtained at the optimum V/III ratio. Oxygen impurities and screw-component dislocations around hillocks are found to have more detrimental impact on the leakage current mechanism.

  10. ZnO nanorods/graphene/Ni/Au hybrid structures as transparent conductive layer in GaN LED for low work voltage and high light extraction

    Science.gov (United States)

    Xu, Kun; Xie, Yiyang; Ma, Huali; Du, Yinxiao; Zeng, Fanguang; Ding, Pei; Gao, Zhiyuan; Xu, Chen; Sun, Jie

    2016-12-01

    In this paper, by virtue of one-dimensional ZnO nanorods and two-dimensional graphene film hybrid structures, both the enhanced current spreading and enhanced light extraction were realized at the same time. A 1 nm/1 nm Ni/Au layer was used as an interlayer between graphene and pGaN to form ohmic contact, which makes the device have a good forward conduction properties. Through the comparison of the two groups of making ZnO nanorods or not, it was found that the 30% light extraction efficiency of the device was improved by using the ZnO nanorods. By analysis key parameters of two groups such as the turn-on voltage, work voltage and reverse leakage current, it was proved that the method for preparing surface nano structure by hydrothermal method self-organization growth ZnO nanorods applied in GaN LEDs has no influence to device's electrical properties. The hybrid structure application in GaN LED, make an achievement of a good ohmic contact, no use of ITO and enhancement of light extraction at the same time, meanwhile it does not change the device structure, introduce additional process, worsen the electrical properties.

  11. Structural, electrical and luminescent characteristics of ultraviolet light emitting structures grown by hydride vapor phase epitaxy

    Directory of Open Access Journals (Sweden)

    A.Y. Polyakov

    2017-03-01

    Full Text Available Electrical and luminescent properties of near-UV light emitting diode structures (LEDs prepared by hydride vapor phase epitaxy (HVPE were studied. Variations in photoluminescence and electroluminescence efficiency observed for LEDs grown under nominally similar conditions could be attributed to the difference in the structural quality (dislocation density, density of dislocations agglomerates of the GaN active layers, to the difference in strain relaxation achieved by growth of AlGaN/AlGaN superlattice and to the presence of current leakage channels in current confining AlGaN layers of the double heterostructure.

  12. Growth of gallium nitride based devices on silicon(001) substrates by metalorganic vapor phase epitaxy; Wachstum von Galliumnitrid-basierten Bauelementen auf Silizium(001)-Substraten mittels metallorganischer Gasphasenepitaxie

    Energy Technology Data Exchange (ETDEWEB)

    Reiher, Fabian

    2009-02-25

    The main topic of this thesis is to investigate GaN-based layer systems grown by metalorganic vapor phase epitaxy on Si(001) substrates. A temperature shift up to 45 K is measured for a complete device structure on a 2-inch silicon substrate. By using a 40 nm thin LT-AlN-seed layer (680 C), the GaN crystallites on Si(001) substrates are almost oriented with their GaN(10 anti 12)-planes parallel to the Si(001)-plane. A four-fold azimuthal symmetry occurs for these layers, with the GaN[10 anti 11]-direction is aligned parallel to one of the four equivalent left angle 110 right angle -directions, respectively. However, a mono-crystalline and fully coalesced GaN-layer with this crystallographic orientation could not yet been obtained. If a deposition temperature of more than 1100 C is used for the AlN-seed layer, solely the GaN[0001]- growth direction of crystallites occurs in the main GaN layer on Si(001) substrates. These c-axis oriented GaN columns feature two opposite azimuthal alignments that are rotated by 90 with respect to each other and with GaN[11 anti 20] parallel Si[110] and GaN[10 anti 10] parallel Si[110], respectively. By using 4 off-oriented substrates towards the Si[110]-direction, one certain azimuthal texture component can be selected. The critical value of the miscut angle corresponds to theoretical calculations predicting the occurrence of atomic double steps on the Si(001) surface. The achieved crystallographic quality of the GaN layers on Si(001) is characterized by having a tilt of FWHM=0.27 and a twist of FWHM=0.8 of the crystallites, determined by X-ray diffraction. A completely crack-free, up to 2.5 {mu}m thick, and mono-crystalline GaN-template can be realized on Si(001), integrating 4 or 5 LT-AlN-interlayers in the GaN buffer structure. Based on this structure, the first successful implementation of an (InGaN/GaN)-LED on Si(001) is achieved. Furthermore, the possible fabrication of GaN-based FET-structures is demonstrated with a fully

  13. Epitaxial synthesis of diamond layers on a monocrystalline diamond substrate in a torch microwave plasmatron

    Energy Technology Data Exchange (ETDEWEB)

    Sergeichev, K. F., E-mail: kserg@fpl.gpi.ru; Lukina, N. A. [Prokhorov Institute of General Physics (Russian Federation)

    2011-12-15

    The epitaxial growth of a diamond single-crystal film in a torch microwave discharge excited by a magnetron of a domestic microwave oven with the power of {<=}1 kW in an argon-hydrogen-methane mixture with a high concentration of methane (up to 25% with respect to hydrogen) at atmospheric pressure on a sub-strate of a synthetic diamond single crystal (HPHP) with the orientation (100) and 4 Multiplication-Sign 4 mm in size is obtained. A discharge with the torch diameter of {approx}2 mm and the concentration of the microwave power absorbed in the torch volume of >10{sup 3} W/cm{sup 3} is shown to be effective for epitaxial enlargement of a single crystal of synthetic diamond. The structure of the deposited film with the thickness up to 10 {mu}m with high-quality morphology is investigated with an optical microscope as well as using the methods of the Raman scattering and scanning electron microscopy.

  14. GaN Nanowire Arrays for High-Output Nanogenerators

    KAUST Repository

    Huang, Chi-Te

    2010-04-07

    Three-fold symmetrically distributed GaN nanowire (NW) arrays have been epitaxially grown on GaN/sapphire substrates. The GaN NW possesses a triangular cross section enclosed by (0001), (2112), and (2112) planes, and the angle between the GaN NW and the substrate surface is ∼62°. The GaN NW arrays produce negative output voltage pulses when scanned by a conductive atomic force microscope in contact mode. The average of piezoelectric output voltage was about -20 mV, while 5-10% of the NWs had piezoelectric output voltages exceeding -(0.15-0.35) V. The GaN NW arrays are highly stable and highly tolerate to moisture in the atmosphere. The GaN NW arrays demonstrate an outstanding potential to be utilized for piezoelectric energy generation with a performance probably better than that of ZnO NWs. © 2010 American Chemical Society.

  15. Surface structure and surface kinetics of InN grown by plasma-assisted atomic layer epitaxy: A HREELS study

    Energy Technology Data Exchange (ETDEWEB)

    Acharya, Ananta R., E-mail: aacharya@georgiasouthern.edu, E-mail: anantaach@gmail.com [Department of Physics, Georgia Southern University, Statesboro, Georgia 30460 (United States); Thoms, Brian D. [Department of Physics and Astronomy, Georgia State University, Atlanta, Georgia 30303 (United States); Nepal, Neeraj [American Association for Engineering Education, 1818 N Street NW, Washington, DC 20034 (United States); Eddy, Charles R. [Electronics Science and Technology Division, U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375 (United States)

    2015-03-15

    The surface bonding configuration and kinetics of hydrogen desorption from InN grown by plasma-assisted atomic layer epitaxy have been investigated. High resolution electron energy loss spectra exhibited loss peaks assigned to a Fuchs–Kliewer surface phonon, N-N and N-H surface species. The surface N-N vibrations are attributed to surface defects. The observation of N-H but no In-H surface species suggested N-terminated InN. Isothermal desorption data were best fit by the first-order desorption kinetics with an activation energy of (0.88 ± 0.06) eV and pre-exponential factor of (1.5 ± 0.5) × 10{sup 5 }s{sup −1}.

  16. Interfacial characteristics of Y2O3/GaSb(001) grown by molecular beam epitaxy and atomic layer deposition

    Science.gov (United States)

    Lin, Y. H.; Lin, K. Y.; Hsueh, W. J.; Young, L. B.; Chang, T. W.; Chyi, J. I.; Pi, T. W.; Kwo, J.; Hong, M.

    2017-11-01

    High quality Y2O3 on GaSb was achieved using both molecular beam epitaxy (MBE) and atomic layer deposition (ALD) with interfacial characteristics studied by in-situ X-ray photoelectron spectroscopy (XPS) and metal-oxide-semiconductor (MOS) electrical measurements. Ga-oxide and stoichiometric Sb-oxides were obtained in the MBE-Y2O3/GaSb and non-stoichiometric Sb2Ox (x<4) was found in the ALD-Y2O3/GaSb according to the XPS spectra. From the capacitance-voltage (CV) measurements, MBE-Y2O3 provides lower interfacial trap density (Dit) grown at elevated temperature of 200°C, while ALD-grown Y2O3 shows smaller hysteresis and higher dielectric constant.

  17. Electroburning of few-layer graphene flakes, epitaxial graphene, and turbostratic graphene discs in air and under vacuum.

    Science.gov (United States)

    Candini, Andrea; Richter, Nils; Convertino, Domenica; Coletti, Camilla; Balestro, Franck; Wernsdorfer, Wolfgang; Kläui, Mathias; Affronte, Marco

    2015-01-01

    Graphene-based electrodes are very promising for molecular electronics and spintronics. Here we report a systematic characterization of the electroburning (EB) process, leading to the formation of nanometer-spaced gaps, on different types of few-layer graphene (namely mechanically exfoliated graphene on SiO2, graphene epitaxially grown on the C-face of SiC and turbostratic graphene discs deposited on SiO2) under air and vacuum conditions. The EB process is found to depend on both the graphene type and on the ambient conditions. For the mechanically exfoliated graphene, performing EB under vacuum leads to a higher yield of nanometer-gap formation than working in air. Conversely, for graphene on SiC the EB process is not successful under vacuum. Finally, the EB is possible with turbostratic graphene discs only after the creation of a constriction in the sample using lithographic patterning.

  18. Electroburning of few-layer graphene flakes, epitaxial graphene, and turbostratic graphene discs in air and under vacuum

    Directory of Open Access Journals (Sweden)

    Andrea Candini

    2015-03-01

    Full Text Available Graphene-based electrodes are very promising for molecular electronics and spintronics. Here we report a systematic characterization of the electroburning (EB process, leading to the formation of nanometer-spaced gaps, on different types of few-layer graphene (namely mechanically exfoliated graphene on SiO2, graphene epitaxially grown on the C-face of SiC and turbostratic graphene discs deposited on SiO2 under air and vacuum conditions. The EB process is found to depend on both the graphene type and on the ambient conditions. For the mechanically exfoliated graphene, performing EB under vacuum leads to a higher yield of nanometer-gap formation than working in air. Conversely, for graphene on SiC the EB process is not successful under vacuum. Finally, the EB is possible with turbostratic graphene discs only after the creation of a constriction in the sample using lithographic patterning.

  19. High-quality III-nitride films on conductive, transparent (2̅01)-oriented β-Ga2O3 using a GaN buffer layer

    Science.gov (United States)

    Muhammed, M. M.; Roldan, M. A.; Yamashita, Y.; Sahonta, S.-L.; Ajia, I. A.; Iizuka, K.; Kuramata, A.; Humphreys, C. J.; Roqan, I. S.

    2016-07-01

    We demonstrate the high structural and optical properties of InxGa1-xN epilayers (0 ≤ x ≤ 23) grown on conductive and transparent (01)-oriented β-Ga2O3 substrates using a low-temperature GaN buffer layer rather than AlN buffer layer, which enhances the quality and stability of the crystals compared to those grown on (100)-oriented β-Ga2O3. Raman maps show that the 2″ wafer is relaxed and uniform. Transmission electron microscopy (TEM) reveals that the dislocation density reduces considerably (~4.8 × 107 cm-2) at the grain centers. High-resolution TEM analysis demonstrates that most dislocations emerge at an angle with respect to the c-axis, whereas dislocations of the opposite phase form a loop and annihilate each other. The dislocation behavior is due to irregular (01) β-Ga2O3 surface at the interface and distorted buffer layer, followed by relaxed GaN epilayer. Photoluminescence results confirm high optical quality and time-resolved spectroscopy shows that the recombination is governed by bound excitons. We find that a low root-mean-square average (≤1.5 nm) of InxGa1-xN epilayers can be achieved with high optical quality of InxGa1-xN epilayers. We reveal that (01)-oriented β-Ga2O3 substrate has a strong potential for use in large-scale high-quality vertical light emitting device design.

  20. High-quality III-nitride films on conductive, transparent (2̅01)-oriented β-Ga2O3 using a GaN buffer layer

    KAUST Repository

    Mumthaz Muhammed, Mufasila

    2016-07-14

    We demonstrate the high structural and optical properties of InxGa1−xN epilayers (0 ≤ x ≤ 23) grown on conductive and transparent (01)-oriented β-Ga2O3 substrates using a low-temperature GaN buffer layer rather than AlN buffer layer, which enhances the quality and stability of the crystals compared to those grown on (100)-oriented β-Ga2O3. Raman maps show that the 2″ wafer is relaxed and uniform. Transmission electron microscopy (TEM) reveals that the dislocation density reduces considerably (~4.8 × 107 cm−2) at the grain centers. High-resolution TEM analysis demonstrates that most dislocations emerge at an angle with respect to the c-axis, whereas dislocations of the opposite phase form a loop and annihilate each other. The dislocation behavior is due to irregular (01) β-Ga2O3 surface at the interface and distorted buffer layer, followed by relaxed GaN epilayer. Photoluminescence results confirm high optical quality and time-resolved spectroscopy shows that the recombination is governed by bound excitons. We find that a low root-mean-square average (≤1.5 nm) of InxGa1−xN epilayers can be achieved with high optical quality of InxGa1−xN epilayers. We reveal that (01)-oriented β-Ga2O3 substrate has a strong potential for use in large-scale high-quality vertical light emitting device design.

  1. Growth rate independence of Mg doping in GaN grown by plasma-assisted MBE

    Science.gov (United States)

    Turski, Henryk; Muzioł, Grzegorz; Siekacz, Marcin; Wolny, Pawel; Szkudlarek, Krzesimir; Feduniewicz-Żmuda, Anna; Dybko, Krzysztof; Skierbiszewski, Czeslaw

    2018-01-01

    Doping of Ga(Al)N layers by plasma-assisted molecular beam epitaxy in Ga-rich conditions on c-plane bulk GaN substrates was studied. Ga(Al)N samples, doped with Mg or Si, grown using different growth conditions were compared. In contrast to Si doped layers, no change in the Mg concentration was observed for layers grown using different growth rates for a constant Mg flux and constant growth temperature. This effect enables the growth of Ga(Al)N:Mg layers at higher growth rates, leading to shorter growth time and lower residual background doping, without the need of increasing Mg flux. Enhancement of Mg incorporation for Al containing layers was also observed. Change of Al content from 0% to 17% resulted in more than two times higher Mg concentration.

  2. Probing defect states in polycrystalline GaN grown on Si(111) by sub-bandgap laser-excited scanning tunneling spectroscopy

    Science.gov (United States)

    Hsiao, F.-M.; Schnedler, M.; Portz, V.; Huang, Y.-C.; Huang, B.-C.; Shih, M.-C.; Chang, C.-W.; Tu, L.-W.; Eisele, H.; Dunin-Borkowski, R. E.; Ebert, Ph.; Chiu, Y.-P.

    2017-01-01

    We demonstrate the potential of sub-bandgap laser-excited cross-sectional scanning tunneling microscopy and spectroscopy to investigate the presence of defect states in semiconductors. The characterization method is illustrated on GaN layers grown on Si(111) substrates without intentional buffer layers. According to high-resolution transmission electron microscopy and cathodoluminescence spectroscopy, the GaN layers consist of nanoscale wurtzite and zincblende crystallites with varying crystal orientations and hence contain high defect state densities. In order to discriminate between band-to-band excitation and defect state excitations, we use sub-bandgap laser excitation. We probe a clear increase in the tunnel current at positive sample voltages during sub-bandgap laser illumination for the GaN layer with high defect density, but no effect is found for high quality GaN epitaxial layers. This demonstrates the excitation of free charge carriers at defect states. Thus, sub-bandgap laser-excited scanning tunneling spectroscopy is a powerful complimentary characterization tool for defect states.

  3. Contactless monitoring of Ge content and B concentration in ultrathin single and double layer Si1-xGex epitaxial films using multiwavelength micro-Raman spectroscopy

    Directory of Open Access Journals (Sweden)

    Chun-Wei Chang

    2012-03-01

    Full Text Available Non-contact monitoring of Ge content and B concentration in single and double Si1-xGex epitaxial layers on Si(100 device wafers was attempted using high-resolution, multiwavelength micro-Raman spectroscopy. The Ge content and B concentration determined by secondary ion mass spectroscopy (SIMS depth profiling showed very strong correlation with the position and full-width-at-half-maximum of the Si-Si peak from the Si1-xGex epitaxial layers as determined by Raman measurements. High resolution X-ray diffraction (HRXRD characterization was done for all wafers to determine Ge and B sensitivity and form comparisons with Raman and SIMS analysis. The non-destructive, in-line monitoring of Ge content and B concentration of single and double Si1-xGex epitaxial layers with thickness ranging from 5 ∼ 120 nm, on small area monitoring pads, was successfully demonstrated by multiwavelength micro-Raman spectroscopy during epitaxial process optimization, material property verification, and quality control applications.

  4. Increase the threshold voltage of high voltage GaN transistors by low temperature atomic hydrogen treatment

    Energy Technology Data Exchange (ETDEWEB)

    Erofeev, E. V., E-mail: erofeev@micran.ru [Tomsk State University of Control Systems and Radioelectronics, Research Institute of Electrical-Communication Systems (Russian Federation); Fedin, I. V.; Kutkov, I. V. [Research and Production Company “Micran” (Russian Federation); Yuryev, Yu. N. [National Research Tomsk Polytechnic University, Institute of Physics and Technology (Russian Federation)

    2017-02-15

    High-electron-mobility transistors (HEMTs) based on AlGaN/GaN epitaxial heterostructures are a promising element base for the fabrication of high voltage electronic devices of the next generation. This is caused by both the high mobility of charge carriers in the transistor channel and the high electric strength of the material, which makes it possible to attain high breakdown voltages. For use in high-power switches, normally off-mode GaN transistors operating under enhancement conditions are required. To fabricate normally off GaN transistors, one most frequently uses a subgate region based on magnesium-doped p-GaN. However, optimization of the p-GaN epitaxial-layer thickness and the doping level makes it possible to attain a threshold voltage of GaN transistors close to V{sub th} = +2 V. In this study, it is shown that the use of low temperature treatment in an atomic hydrogen flow for the p-GaN-based subgate region before the deposition of gate-metallization layers makes it possible to increase the transistor threshold voltage to V{sub th} = +3.5 V. The effects under observation can be caused by the formation of a dipole layer on the p-GaN surface induced by the effect of atomic hydrogen. The heat treatment of hydrogen-treated GaN transistors in a nitrogen environment at a temperature of T = 250°C for 12 h reveals no degradation of the transistor’s electrical parameters, which can be caused by the formation of a thermally stable dipole layer at the metal/p-GaN interface as a result of hydrogenation.

  5. Structural properties of relaxed thin film germanium layers grown by low temperature RF-PECVD epitaxy on Si and Ge (100) substrates

    Energy Technology Data Exchange (ETDEWEB)

    Cariou, R., E-mail: romain.cariou@polytechnique.edu [LPICM-CNRS, Ecole Polytechnique, 91128, Palaiseau (France); III-V lab a joint laboratory between Alcatel-Lucent Bell Labs France, Thales Research and Technology and CEA-LETI, route de Nozay, 91460, Marcoussis, France. (France); Ruggeri, R. [LPICM-CNRS, Ecole Polytechnique, 91128, Palaiseau (France); CNR-IMM, strada VIII n°5, zona industriale, 95121, Catania (Italy); Tan, X.; Nassar, J.; Roca i Cabarrocas, P. [LPICM-CNRS, Ecole Polytechnique, 91128, Palaiseau (France); Mannino, Giovanni [CNR-IMM, strada VIII n°5, zona industriale, 95121, Catania (Italy)

    2014-07-15

    We report on unusual low temperature (175 °C) heteroepitaxial growth of germanium thin films using a standard radio-frequency plasma process. Spectroscopic ellipsometry and transmission electron microscopy (TEM) reveal a perfect crystalline quality of epitaxial germanium layers on (100) c-Ge wafers. In addition direct germanium crystal growth is achieved on (100) c-Si, despite 4.2% lattice mismatch. Defects rising from Ge/Si interface are mostly located within the first tens of nanometers, and threading dislocation density (TDD) values as low as 10{sup 6} cm{sup −2} are obtained. Misfit stress is released fast: residual strain of −0.4% is calculated from Moiré pattern analysis. Moreover we demonstrate a striking feature of low temperature plasma epitaxy, namely the fact that crystalline quality improves with thickness without epitaxy breakdown, as shown by TEM and depth profiling of surface TDD.

  6. Structural properties of relaxed thin film germanium layers grown by low temperature RF-PECVD epitaxy on Si and Ge (100 substrates

    Directory of Open Access Journals (Sweden)

    R. Cariou

    2014-07-01

    Full Text Available We report on unusual low temperature (175 °C heteroepitaxial growth of germanium thin films using a standard radio-frequency plasma process. Spectroscopic ellipsometry and transmission electron microscopy (TEM reveal a perfect crystalline quality of epitaxial germanium layers on (100 c-Ge wafers. In addition direct germanium crystal growth is achieved on (100 c-Si, despite 4.2% lattice mismatch. Defects rising from Ge/Si interface are mostly located within the first tens of nanometers, and threading dislocation density (TDD values as low as 106 cm−2 are obtained. Misfit stress is released fast: residual strain of −0.4% is calculated from Moiré pattern analysis. Moreover we demonstrate a striking feature of low temperature plasma epitaxy, namely the fact that crystalline quality improves with thickness without epitaxy breakdown, as shown by TEM and depth profiling of surface TDD.

  7. Measuring the composition of AlGaN layers in GaN based structures grown on 150 mm Si substrates using (2 0 5) reciprocal space maps

    Science.gov (United States)

    Wallis, D. J.; Zhu, D.; Oehler, F.; Westwater, S. P.; Pujol, A.; Humphreys, C. J.

    2013-09-01

    A critical element for the successful growth of GaN device layers on Si is accurate control of the AlGaN buffer layers used to manage strain. Here we present a method for measuring the composition of the AlGaN buffer layers in device structures which makes use of a one-dimensional x-ray detector to provide efficient measurement of a reciprocal space map which covers the full compositional range from AlN to GaN. Combining this with a suitable x-ray reflection with low strain sensitivity it is possible to accurately determine the Al fraction of the buffer layers independent of their relaxation state.

  8. Epitaxial hexagonal materials on IBAD-textured substrates

    Science.gov (United States)

    Matias, Vladimir; Yung, Christopher

    2017-08-15

    A multilayer structure including a hexagonal epitaxial layer, such as GaN or other group III-nitride (III-N) semiconductors, a oriented textured layer, and a non-single crystal substrate, and methods for making the same. The textured layer has a crystalline alignment preferably formed by the ion-beam assisted deposition (IBAD) texturing process and can be biaxially aligned. The in-plane crystalline texture of the textured layer is sufficiently low to allow growth of high quality hexagonal material, but can still be significantly greater than the required in-plane crystalline texture of the hexagonal material. The IBAD process enables low-cost, large-area, flexible metal foil substrates to be used as potential alternatives to single-crystal sapphire and silicon for manufacture of electronic devices, enabling scaled-up roll-to-roll, sheet-to-sheet, or similar fabrication processes to be used. The user is able to choose a substrate for its mechanical and thermal properties, such as how well its coefficient of thermal expansion matches that of the hexagonal epitaxial layer, while choosing a textured layer that more closely lattice matches that layer.

  9. Epitaxial hexagonal materials on IBAD-textured substrates

    Energy Technology Data Exchange (ETDEWEB)

    Matias, Vladimir; Yung, Christopher

    2017-08-15

    A multilayer structure including a hexagonal epitaxial layer, such as GaN or other group III-nitride (III-N) semiconductors, a <111> oriented textured layer, and a non-single crystal substrate, and methods for making the same. The textured layer has a crystalline alignment preferably formed by the ion-beam assisted deposition (IBAD) texturing process and can be biaxially aligned. The in-plane crystalline texture of the textured layer is sufficiently low to allow growth of high quality hexagonal material, but can still be significantly greater than the required in-plane crystalline texture of the hexagonal material. The IBAD process enables low-cost, large-area, flexible metal foil substrates to be used as potential alternatives to single-crystal sapphire and silicon for manufacture of electronic devices, enabling scaled-up roll-to-roll, sheet-to-sheet, or similar fabrication processes to be used. The user is able to choose a substrate for its mechanical and thermal properties, such as how well its coefficient of thermal expansion matches that of the hexagonal epitaxial layer, while choosing a textured layer that more closely lattice matches that layer.

  10. Fabrication of large flat gallium nitride templates with extremely low dislocation densities in the 106 cm-2 range by novel two-side hydride vapor-phase epitaxial growth

    Science.gov (United States)

    Fujikura, Hajime; Konno, Taichiro

    2017-10-01

    Large GaN templates with high flatness (i.e., negligible wafer bowing and smooth as-grown surfaces) and low threading dislocation densities (TTDs) were fabricated by a novel two-side hydride vapor-phase epitaxial (HVPE) growth, beginning with deposition of polycrystalline GaN on the rear side of the wafer. Appropriate gas-flow management realized by our homemade HVPE system permitted the growth of a GaN layer with a smooth as-grown surface and excellent thickness uniformity on the front surfaces of 4- or 6-inch patterned sapphire substrates (PSSs). However, when the grown thickness exceeded 20 μm, single-side HVPE-growth induced fractures in GaN crystals. The fracture resistance of the GaN increased markedly when it was in a cleavage-resistant polycrystalline form (poly-GaN), permitting its growth to a thickness of 100 μm. In the presence of a back-side poly-GaN layer, extremely thick GaN crystal layers could be grown on the front side without fractures. An 80-μm-thick GaN template fabricated by two-side growth on a 4-inch PSS had a device-quality surface, negligible bowing, and low TDD (7 × 106 cm-2). Issues of high fabrication costs, unavailability of large-size wafers, and large off-angle variations associated with native GaN wafers could be overcome by using our high-quality GaN templates as alternative substrates.

  11. Room temperature ferromagnetism in cubic GaN epilayers implanted with Mn+ ions

    Science.gov (United States)

    Chitta, V. A.; Coaquira, J. A. H.; Fernandez, J. R. L.; Duarte, C. A.; Leite, J. R.; Schikora, D.; As, D. J.; Lischka, K.; Abramof, E.

    2004-10-01

    Mn ions were implanted in p-type cubic GaN at doses from 0.6 to 2.4×1016cm-2 at 200 keV energy. A 200-nm-thick epitaxial layer, grown by molecular beam epitaxy on GaAs(001) substrate, is used for the Mn implantation. The Mn implanted samples were subjected to an annealing at 950 °C for 1-5 min. The structural quality of the samples was investigated by high resolution x-ray diffraction and Raman spectroscopy. The annealing procedure leads to a significant increasing of the crystalline quality of the samples. Hysteresis loops were observed for all cubic GaMnN annealed samples and ferromagnetism was detected up to room temperature.

  12. Characterization of crystallinity of Ge{sub 1−x}Sn{sub x} epitaxial layers grown using metal-organic chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Inuzuka, Yuki [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Ike, Shinichi; Asano, Takanori [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Japan Society for the Promotion of Science, Chiyoda-ku, Tokyo 102-8472 (Japan); Takeuchi, Wakana [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Nakatsuka, Osamu, E-mail: nakatuka@alice.xtal.nagoya-u.ac.jp [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); Zaima, Shigeaki [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan); EcoTopia Science Institute, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)

    2016-03-01

    The epitaxial growth of a Ge{sub 1−x}Sn{sub x} layer was examined using metal-organic chemical vapor deposition (MOCVD) with two types of Ge precursors; tetra-ethyl-germane (TEGe) and tertiary-butyl-germane (TBGe); and the Sn precursor tri-butyl-vinyl-tin (TBVSn). Though the growth of a Ge{sub 1−x}Sn{sub x} layer on a Ge(001) substrate by MOCVD has been reported, a high-Sn-content Ge{sub 1−x}Sn{sub x} layer and the exploration of MO material combinations for Ge{sub 1−x}Sn{sub x} growth have not been reported. Therefore, the epitaxial growth of a Ge{sub 1−x}Sn{sub x} layer on Ge(001) and Si(001) substrates was examined using these precursors. The Ge{sub 1−x}Sn{sub x} layers were pseudomorphically grown on a Ge(001) substrate, while the Ge{sub 1−x}Sn{sub x} layer with a high degree of strain relaxation was obtained on a Si(001) substrate. Additionally, it was found that the two Ge precursors have different growth temperature ranges, where the TBGe could realize a higher growth rate at a lower growth temperature than the TEGe. The Ge{sub 1−x}Sn{sub x} layers grown using a combination of TBGe and TBVSn exhibited a higher crystalline quality and a smoother surface compared with the Ge{sub 1−x}Sn{sub x} layer prepared by low-temperature molecular beam epitaxy. In this study, a Ge{sub 1−x}Sn{sub x} epitaxial layer with a Sn content as high as 5.1% on a Ge(001) substrate was achieved by MOCVD at 300 °C. - Highlights: • Tertiary-butyl-germane and tri-butyl-vinyl-tin are suitable for Ge{sub 1−x}Sn{sub x} MOCVD growth. • We achieved a Sn content of 5.1% in Ge{sub 1−x}Sn{sub x} epitaxial layer on Ge(001). • The Ge{sub 1−x}Sn{sub x} layers grown on Ge and Si by MOCVD have high crystalline quality.

  13. GaN Micromechanical Resonators with Meshed Metal Bottom Electrode

    Directory of Open Access Journals (Sweden)

    Azadeh Ansari

    2015-03-01

    Full Text Available This work describes a novel architecture to realize high-performance gallium nitride (GaN bulk acoustic wave (BAW resonators. The method is based on the growth of a thick GaN layer on a metal electrode grid. The fabrication process starts with the growth of a thin GaN buffer layer on a Si (111 substrate. The GaN buffer layer is patterned and trenches are made and refilled with sputtered tungsten (W/silicon dioxide (SiO2 forming passivated metal electrode grids. GaN is then regrown, nucleating from the exposed GaN seed layer and coalescing to form a thick GaN device layer. A metal electrode can be deposited and patterned on top of the GaN layer. This method enables vertical piezoelectric actuation of the GaN layer using its largest piezoelectric coefficient (d33 for thickness-mode resonance. Having a bottom electrode also results in a higher coupling coefficient, useful for the implementation of acoustic filters. Growth of GaN on Si enables releasing the device from the frontside using isotropic xenon difluoride (XeF2 etch and therefore eliminating the need for backside lithography and etching.

  14. Van der Waals Epitaxial Growth of Atomic Layered HfS2Crystals for Ultrasensitive Near-Infrared Phototransistors.

    Science.gov (United States)

    Fu, Lei; Wang, Feng; Wu, Bin; Wu, Nian; Huang, Wei; Wang, Hanlin; Jin, Chuanhong; Zhuang, Lin; He, Jun; Fu, Lei; Liu, Yunqi

    2017-08-01

    As a member of the group IVB transition metal dichalcogenides (TMDs) family, hafnium disulfide (HfS 2 ) is recently predicted to exhibit higher carrier mobility and higher tunneling current density than group VIB (Mo and W) TMDs. However, the synthesis of high-quality HfS 2 crystals, sparsely reported, has greatly hindered the development of this new field. Here, a facile strategy for controlled synthesis of high-quality atomic layered HfS 2 crystals by van der Waals epitaxy is reported. Density functional theory calculations are applied to elucidate the systematic epitaxial growth process of the S-edge and Hf-edge. Impressively, the HfS 2 back-gate field-effect transistors display a competitive mobility of 7.6 cm 2 V -1 s -1 and an ultrahigh on/off ratio exceeding 10 8 . Meanwhile, ultrasensitive near-infrared phototransistors based on the HfS 2 crystals (indirect bandgap ≈1.45 eV) exhibit an ultrahigh responsivity exceeding 3.08 × 10 5 A W -1 , which is 10 9 -fold higher than 9 × 10 -5 A W -1 obtained from the multilayer MoS 2 in near-infrared photodetection. Moreover, an ultrahigh photogain exceeding 4.72 × 10 5 and an ultrahigh detectivity exceeding 4.01 × 10 12 Jones, superior to the vast majority of the reported 2D-materials-based phototransistors, imply a great promise in TMD-based 2D electronic and optoelectronic applications. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  15. Dislocation-assisted tunnelling of charge carriers across the Schottky barrier on the hydride vapour phase epitaxy grown GaN

    Science.gov (United States)

    Chatterjee, Abhishek; Khamari, Shailesh K.; Dixit, V. K.; Oak, S. M.; Sharma, T. K.

    2015-11-01

    Barrier height and Ideality factor of Ni/n-GaN Schottky diodes are measured by performing temperature dependent current-voltage measurements. The measured value of barrier height is found to be much smaller than the theoretically calculated Schottky-Mott barrier height for the Ni/n-GaN diodes. Furthermore, a high value of ideality factor (>2) is measured at low temperatures. In order to understand these results, we need to consider a double Gaussian distribution of barrier height where the two components are related to the thermionic emission and thermionic filed emission mediated by dislocation-assisted tunnelling of carriers across the Schottky barrier. Thermionic emission is seen to dominate at temperatures higher than 170 K while the dislocation-assisted tunnelling dominates at low temperatures. The value of characteristic tunnelling energy measured from the forward bias current-voltage curves also confirms the dominance of dislocation-assisted tunnelling at low temperatures which is strongly corroborated by the Hall measurements. However, the value of characteristic tunnelling energy for high temperature range cannot be supported by the Hall results. This discrepancy can be eliminated by invoking a two layer model to analyse the Hall data which confirms that the charged dislocations, which reach the sample surface from the layer-substrate interface, provide an alternate path for the transport of carriers. The dislocation-assisted tunnelling of carriers governs the values of Schottky diode parameters at low temperature and the same is responsible for the observed inhomogeneity in the values of barrier height. The present analysis is applicable wherever the charge transport characteristics are severely affected by the presence of a degenerate layer at GaN-Sapphire interface and dislocations lines pierce the Schottky junction to facilitate the tunnelling of carriers.

  16. InGaN/GaN multilayer quantum dots yellow-green light-emitting diode with optimized GaN barriers.

    Science.gov (United States)

    Lv, Wenbin; Wang, Lai; Wang, Jiaxing; Hao, Zhibiao; Luo, Yi

    2012-11-07

    InGaN/GaN multilayer quantum dot (QD) structure is a potential type of active regions for yellow-green light-emitting diodes (LEDs). The surface morphologies and crystalline quality of GaN barriers are critical to the uniformity of InGaN QD layers. While GaN barriers were grown in multi-QD layers, we used improved growth parameters by increasing the growth temperature and switching the carrier gas from N2 to H2 in the metal organic vapor phase epitaxy. As a result, a 10-layer InGaN/GaN QD LED is demonstrated successfully. The transmission electron microscopy image shows the uniform multilayer InGaN QDs clearly. As the injection current increases from 5 to 50 mA, the electroluminescence peak wavelength shifts from 574 to 537 nm.

  17. Arsenic-doped high-resistivity-silicon epitaxial layers for integrating low-capacitance diodes

    NARCIS (Netherlands)

    Sakic, A.; Scholtes, T.L.M.; De Boer, W.B.; Golshani, N.; Derakhshandeh, J.; Nanver, L.K.

    2011-01-01

    An arsenic doping technique for depositing up to 40-?m-thick high-resistivity layers is presented for fabricating diodes with low RC constants that can be integrated in closely-packed configurations. The doping of the as-grown epi-layers is controlled down to 5 × 1011 cm?3, a value that is solely

  18. Vertical 2D/3D Semiconductor Heterostructures Based on Epitaxial Molybdenum Disulfide and Gallium Nitride.

    Science.gov (United States)

    Ruzmetov, Dmitry; Zhang, Kehao; Stan, Gheorghe; Kalanyan, Berc; Bhimanapati, Ganesh R; Eichfeld, Sarah M; Burke, Robert A; Shah, Pankaj B; O'Regan, Terrance P; Crowne, Frank J; Birdwell, A Glen; Robinson, Joshua A; Davydov, Albert V; Ivanov, Tony G

    2016-03-22

    When designing semiconductor heterostructures, it is expected that epitaxial alignment will facilitate low-defect interfaces and efficient vertical transport. Here, we report lattice-matched epitaxial growth of molybdenum disulfide (MoS2) directly on gallium nitride (GaN), resulting in high-quality, unstrained, single-layer MoS2 with strict registry to the GaN lattice. These results present a promising path toward the implementation of high-performance electronic devices based on 2D/3D vertical heterostructures, where each of the 3D and 2D semiconductors is both a template for subsequent epitaxial growth and an active component of the device. The MoS2 monolayer triangles average 1 μm along each side, with monolayer blankets (merged triangles) exhibiting properties similar to that of single-crystal MoS2 sheets. Photoluminescence, Raman, atomic force microscopy, and X-ray photoelectron spectroscopy analyses identified monolayer MoS2 with a prominent 20-fold enhancement of photoluminescence in the center regions of larger triangles. The MoS2/GaN structures are shown to electrically conduct in the out-of-plane direction, confirming the potential of directly synthesized 2D/3D semiconductor heterostructures for vertical current flow. Finally, we estimate a MoS2/GaN contact resistivity to be less than 4 Ω·cm(2) and current spreading in the MoS2 monolayer of approximately 1 μm in diameter.

  19. Electric field dynamics in nitride structures containing quaternary alloy (Al, In, Ga)N

    Energy Technology Data Exchange (ETDEWEB)

    Borysiuk, J., E-mail: jolanta.borysiuk@ifpan.edu.pl [Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, 02-668 Warsaw (Poland); Faculty of Physics, University of Warsaw, Pasteura 5, 02-093 Warsaw (Poland); Sakowski, K.; Muziol, G.; Krukowski, S. [Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw (Poland); Dróżdż, P. [Faculty of Physics, University of Warsaw, Pasteura 5, 02-093 Warsaw (Poland); Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw (Poland); Korona, K. P. [Faculty of Physics, University of Warsaw, Pasteura 5, 02-093 Warsaw (Poland); Sobczak, K. [Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, 02-668 Warsaw (Poland); Skierbiszewski, C. [Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw (Poland); TopGaN Ltd., Sokolowska 29/37, 01-142 Warsaw (Poland); Kaminska, A. [Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, 02-668 Warsaw (Poland); Department of Mathematics and Natural Sciences, College of Science, Cardinal Stefan Wyszynski University, Dewajtis 5, 01-815 Warsaw (Poland)

    2016-07-07

    Molecular beam epitaxy growth and basic physical properties of quaternary AlInGaN layers, sufficiently thick for construction of electron blocking layers (EBL), embedded in ternary InGaN layers are presented. Transmission electron microscopy (TEM) measurement revealed good crystallographic structure and compositional uniformity of the quaternary layers contained in other nitride layers, which are typical for construction of nitride based devices. The AlInGaN layer was epitaxially compatible to InGaN matrix, strained, and no strain related dislocation creation was observed. The strain penetrated for limited depth, below 3 nm, even for relatively high content of indium (7%). For lower indium content (0.6%), the strain was below the detection limit by TEM strain analysis. The structures containing quaternary AlInGaN layers were studied by time dependent photoluminescence (PL) at different temperatures and excitation powers. It was shown that PL spectra contain three peaks: high energy donor bound exciton peak from the bulk GaN (DX GaN) and the two peaks (A and B) from InGaN layers. No emission from quaternary AlInGaN layers was observed. An accumulation of electrons on the EBL interface in high-In sample and formation of 2D electron gas (2DEG) was detected. The dynamics of 2DEG was studied by time resolved luminescence revealing strong dependence of emission energy on the 2DEG concentration. Theoretical calculations as well as power-dependence and temperature-dependence analysis showed the importance of electric field inside the structure. At the interface, the field was screened by carriers and could be changed by illumination. From these measurements, the dynamics of electric field was described as the discharge of carriers accumulated on the EBL.

  20. van der Waals epitaxy of MoS₂ layers using graphene as growth templates.

    Science.gov (United States)

    Shi, Yumeng; Zhou, Wu; Lu, Ang-Yu; Fang, Wenjing; Lee, Yi-Hsien; Hsu, Allen Long; Kim, Soo Min; Kim, Ki Kang; Yang, Hui Ying; Li, Lain-Jong; Idrobo, Juan-Carlos; Kong, Jing

    2012-06-13

    We present a method for synthesizing MoS(2)/Graphene hybrid heterostructures with a growth template of graphene-covered Cu foil. Compared to other recent reports, (1, 2) a much lower growth temperature of 400 °C is required for this procedure. The chemical vapor deposition of MoS(2) on the graphene surface gives rise to single crystalline hexagonal flakes with a typical lateral size ranging from several hundred nanometers to several micrometers. The precursor (ammonium thiomolybdate) together with solvent was transported to graphene surface by a carrier gas at room temperature, which was then followed by post annealing. At an elevated temperature, the precursor self-assembles to form MoS(2) flakes epitaxially on the graphene surface via thermal decomposition. With higher amount of precursor delivered onto the graphene surface, a continuous MoS(2) film on graphene can be obtained. This simple chemical vapor deposition method provides a unique approach for the synthesis of graphene heterostructures and surface functionalization of graphene. The synthesized two-dimensional MoS(2)/Graphene hybrids possess great potential toward the development of new optical and electronic devices as well as a wide variety of newly synthesizable compounds for catalysts.

  1. Effect of dual buffer layer structure on the epitaxial growth of AlN on sapphire

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, D.G., E-mail: dgzhao@red.semi.ac.cn [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China); Jiang, D.S.; Wu, L.L.; Le, L.C.; Li, L.; Chen, P.; Liu, Z.S. [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China); Zhu, J.J.; Wang, H.; Zhang, S.M. [Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215125 (China); Yang, H. [State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China); Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou 215125 (China)

    2012-12-15

    Highlights: Black-Right-Pointing-Pointer A dual AlN buffer layer structure is proposed to grow AlN films. Black-Right-Pointing-Pointer AlN films could be improved obviously by using the dual AlN buffer layer. Black-Right-Pointing-Pointer The physical mechanism are discussed. - Abstract: A dual AlN buffer layer structure, including an isolated layer and a nucleation layer, is proposed to improve the growth of AlN films on sapphire substrate by metal organic chemical vapor deposition. This method is aimed to weaken the negative nitridation effect and improve lateral growth condition in the initial growth stage. It is found that suitably increasing the thickness of the nucleation layer is in favor of a better structural quality of the AlN film. An examination of surface morphology by atomic force microscopy suggests that the thicker the dual AlN buffer layer, the rougher the surface, and a higher quality of AlN epilayer is resulted.

  2. Ex Situ Thermal Cycle Annealing of Molecular Beam Epitaxy Grown HgCdTe/Si Layers

    Science.gov (United States)

    2010-01-01

    matched bulk CdZnTe substrates. Recent work6 on CdTe/Si has shown that in situ thermal cycle annealing (TCA), where annealing is performed intermittently...was grown on a bulk CdZnTe substrate for comparison. The HgCdTe was grown at 185C, with a growth rate of 2 lm/h. The typical HgCdTe layer...Cd composition. The HgCdTe layers grown on bulk CdZnTe samples, which were subjected to annealing condi- tions similar to those for the HgCdTe layers

  3. Effect of Same-Temperature GaN Cap Layer on the InGaN/GaN Multiquantum Well of Green Light-Emitting Diode on Silicon Substrate

    Directory of Open Access Journals (Sweden)

    Changda Zheng

    2013-01-01

    Full Text Available GaN green LED was grown on Si (111 substrate by MOCVD. To enhance the quality of InGaN/GaN MQWs, same-temperature (ST GaN protection layers with different thickness of 8 Å, 15 Å, and 30 Å were induced after the InGaN quantum wells (QWs layer. Results show that a relative thicker cap layer is benefit to get InGaN QWs with higher In percent at fixed well temperature and obtain better QW/QB interface. As the cap thickness increases, the indium distribution becomes homogeneous as verified by fluorescence microscope (FLM. The interface of MQWs turns to be abrupt from XRD analysis. The intensity of photoluminescence (PL spectrum is increased and the FWHM becomes narrow.

  4. Thermal Annealing induced relaxation of compressive strain in porous GaN structures

    KAUST Repository

    Ben Slimane, Ahmed

    2012-01-01

    The effect of annealing on strain relaxation in porous GaN fabricated using electroless chemical etching is presented. The Raman shift of 1 cm-1 in phonon frequency of annealed porous GaN with respect to as-grown GaN corresponds to a relaxation of compressive strain by 0.41 ± 0.04 GPa. The strain relief promises a marked reduction in threading dislocation for subsequent epitaxial growth.

  5. Aqueous phase synthesis of upconversion nanocrystals through layer-by-layer epitaxial growth for in vivo X-ray computed tomography

    KAUST Repository

    Li, Feifei

    2013-05-21

    Lanthanide-doped core-shell upconversion nanocrystals (UCNCs) have tremendous potential for applications in many fields, especially in bio-imaging and medical therapy. As core-shell UCNCs are mostly synthesized in organic solvents, tedious organic-aqueous phase transfer processes are usually needed for their use in bio-applications. Herein, we demonstrate the first example of one-step synthesis of highly luminescent core-shell UCNCs in the "aqueous" phase under mild conditions using innocuous reagents. A microwave-assisted approach allowed for layer-by-layer epitaxial growth of a hydrophilic NaGdF4 shell on NaYF4:Yb, Er cores. During this process, surface defects of the nanocrystals could be gradually passivated by the homogeneous shell deposition, resulting in obvious enhancement in the overall upconversion emission efficiency. In addition, the up-down conversion dual-mode luminescent NaYF4:Yb, Er@NaGdF4:Ce, Ln (Eu, Tb, Sm, Dy) nanocrystals were also synthesized to further validate the successful formation of the core-shell structure. More significantly, based on their superior solubility and stability in water solution, high upconversion efficiency and Gd-doped predominant X-ray absorption, the as-prepared NaYF4:Yb, Er@NaGdF4 core-shell UCNCs exhibited high contrast in in vitro cell imaging and in vivo X-ray computed tomography (CT) imaging, demonstrating great potential as multiplexed luminescent biolabels and CT contrast agents.

  6. Structural and electronic properties of InN epitaxial layer grown on c-plane sapphire by chemical vapor deposition technique

    Energy Technology Data Exchange (ETDEWEB)

    Barick, Barun Kumar, E-mail: bkbarick@gmail.com; Prasad, Nivedita; Saroj, Rajendra Kumar; Dhar, Subhabrata [Department of Physics, Indian Institute of Technology, Bombay, Mumbai 400076 (India)

    2016-09-15

    Growth of InN epilayers on c-plane sapphire substrate by chemical vapor deposition technique using pure indium metal and ammonia as precursors has been systematically explored. It has been found that [0001] oriented indium nitride epitaxial layers with smooth surface morphology can be grown on c-plane sapphire substrates by optimizing the growth conditions. Bandgap of the film is observed to be Burstein–Moss shifted likely to be due to high background electron concentration. It has been found that the concentration of this unintentional doping decreases with the increase in the growth temperature and the ammonia flux. Epitaxial quality on the other hand deteriorates as the growth temperature increases. Moreover, the morphology of the deposited layer has been found to change from flat top islands to faceted mounds as the flow rate of ammonia increases. This phenomenon is expected to be related to the difference in surface termination character at low and high ammonia flow rates.

  7. Effects of rapid thermal annealing on two-dimensional delocalized electronic states of the epitaxial N δ-doped layer in GaAs

    Energy Technology Data Exchange (ETDEWEB)

    Ogawa, Yasuhiro; Harada, Yukihiro; Baba, Takeshi; Kaizu, Toshiyuki; Kita, Takashi [Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, 1-1 Rokkodai, Nada, Kobe 657-8501 (Japan)

    2016-03-14

    We have conducted rapid thermal annealing (RTA) for improving the two-dimensional (2D) arrangement of electronic states in the epitaxial nitrogen (N) δ-doped layer in GaAs. RTA rearranged the N-pair configurations in the GaAs (001) plane and reduced the number of non-radiative recombination centers. Furthermore, a Landau shift, representing the 2D delocalized electronic states in the (001) plane, was observed at around zero magnetic field intensity in the Faraday configuration.

  8. The role of defects in fluorescent silicon carbide layers grown by sublimation epitaxy

    DEFF Research Database (Denmark)

    Schimmel, Saskia; Kaiser, Michl; Jokubavicius, Valdas

    Donor-acceptor co-doped silicon carbide layers are promising light converters for novel monolithic all-semiconductor LEDs due to their broad-band donor-acceptor pair luminescence and potentially high internal quantum efficiency. Besides appropriate doping concentrations yielding low radiative lif...

  9. Scanning tunneling microscopy and spectroscopy on GaN and InGaN surfaces; Rastertunnelmikroskopie und -spektroskopie an GaN- und InGaN-Oberflaechen

    Energy Technology Data Exchange (ETDEWEB)

    Krueger, David

    2009-12-02

    Optelectronic devices based on gallium nitride (GaN) and indium gallium nitride (InGaN) are in the focus of research since more than 20 years and still have great potential for optical applications. In the first part of this work non-polar surfaces of GaN are investigated by scanning electron microscopy (SEM), atomic force microscopy (AFM) and scanning tunneling microscopy (STM). In SEM and AFM, the (1 anti 100)- and especially the (anti 2110)-plane are quite corrugated. For the first time, the (anti 2110)-plane of GaN is atomically resolved in STM. In the second part InGaN quantum dot layers are investigated by X-ray photoelectron spectroscopy (XPS), scanning tunneling spectroscopy (STS) and STM. The STMmeasurements show the dependency of surface morphology on growth conditions in the metalorganic vapour phase epitaxy (MOVPE). Nucleation, a new MOVPE-strategy, is based on phase separations on surfaces. It is shown that locally varying density of states and bandgaps can be detected by STS, that means bandgap histograms and 2D-bandgap-mapping. (orig.)

  10. Structural and electrical characterization of epitaxial 4H-SiC layers for power electronic device applications

    Energy Technology Data Exchange (ETDEWEB)

    Scaltrito, L.; Porro, S.; Cocuzza, M.; Giorgis, F.; Pirri, C.F.; Mandracci, P.; Ricciardi, C.; Ferrero, S.; Sgorlon, C.; Richieri, G.; Merlin, L.; Castaldini, A.; Cavallini, A.; Polenta, L

    2003-09-15

    In spite of the high potentiality of silicon carbide (SiC), its technology shows at the moment some limitations, due to the defects present in the crystalline structure. We have focused our analysis on commercial 4H-SiC epitaxial layers. A preliminary investigation has been performed by Optical and Scanning Electron microscopies with the aim to evidence the defect morphology on a large scale. An insight on the defect structure has been obtained by Atomic Force Microscopy, profilometer technique, Micro-Raman and Micro-Photoluminescence spectroscopies. Different types of defects such as comets, super dislocations, etch pits and so on, have been characterized finding interesting peculiarities such as different polytypes inclusions. Moreover, the influence of such defects on the SiC electrical performance has been deeply analyzed through the realization of Schottky barriers onto SiC regions including specific kinds of defects, then performing electrical characterization such as current-voltage (I-V) analysis. Deep Level Transient Spectroscopy (DLTS) yielded the energy position in the SiC gap, the concentration and the capture cross section of two center of recombination.

  11. Zinc sulfide and terbium-doped zinc sulfide films grown by traveling wave reactor atomic layer epitaxy

    CERN Document Server

    Yun, S J; Nam, K S

    1998-01-01

    Zinc sulfide (ZnS) and terbium-doped ZnS (ZnS:Tb) thin films were grown by traveling wave reactor atomic layer epitaxy (ALE). In the present work, ZnCl sub 2 , H sub 2 S, and tris (2,2,6,6-tetramethyl-3,5-heptandionato) terbium (Tb(tmhd) sub 3) were used as the precursors. The dependence of crystallinity and Cl content of ZnS films was investigated on the growth temperature. ZnS and ZnS:Tb films grown at temperatures ranging from 400 to 500 .deg. C showed a hexagonal-2H crystalline structure. The crystallinity of ZnS film was greatly enhanced as the temperature increased. At growth temperatures higher than 450.deg.C, the films showed preferred orientation with mainly (002) diffraction peak. The Cl content decreased from approximately 9 to 1 at.% with the increase in growth temperature from 400 to 500 .deg. C. The segregation of Cl near the surface region and the incorporation of O from Tb(tmhd) sub 3 during ALE process were also observed using Auger electron spectroscopy. The ALE-grown ZnS and ZnS:Tb films re...

  12. Effect of the energy of bombarding electrons on the conductivity of n-4H-SiC (CVD) epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Kozlovski, V. V., E-mail: kozlovski@physics.spbstu.ru [Peter the Great St. Petersburg State Polytechnic University (Russian Federation); Lebedev, A. A.; Strel’chuk, A. M.; Davidovskaya, K. S. [Ioffe Physical–Technical Institute (Russian Federation); Vasil’ev, A. E. [Peter the Great St. Petersburg State Polytechnic University (Russian Federation); Makarenko, L. F. [Belarusian State University (Belarus)

    2017-03-15

    The electrical characteristics of epitaxial layers of n-4H-SiC (CVD) irradiated with 0.9 and 3.5MeV electrons are studied. It is shown that the donor removal rate becomes nearly four times higher as the energy of impinging electrons increases by a factor of 4, although the formation cross section of primary radiation defects (Frenkel pairs in the carbon sublattice) responsible for conductivity compensation of the material is almost energy independent in this range. It is assumed that the reason for the observed differences is the influence exerted by primary knocked-out atoms. First, cascade processes start to manifest themselves with increasing energy of primary knocked-out atoms. Second, the average distance between genetically related Frenkel pairs grows, and, as a consequence, the fraction of defects that do not recombine under irradiation becomes larger. The recombination radius of Frenkel pairs in the carbon sublattice is estimated and the possible charge state of the recombining components is assessed.

  13. Epitaxial Growth of MOF Thin Film for Modifying the Dielectric Layer in Organic Field-Effect Transistors.

    Science.gov (United States)

    Gu, Zhi-Gang; Chen, Shan-Ci; Fu, Wen-Qiang; Zheng, Qingdong; Zhang, Jian

    2017-03-01

    Metal-organic framework (MOF) thin films are important in the application of sensors and devices. However, the application of MOF thin films in organic field effect transistors (OFETs) is still a challenge to date. Here, we first use the MOF thin film prepared by a liquid-phase epitaxial (LPE) approach (also called SURMOFs) to modify the SiO 2 dielectric layer in the OFETs. After the semiconductive polymer of PTB7-Th (poly[4,8-bis(5-(2-ethylhexyl)thiophene-2-yl)benzo[1,2-b:4,5-b']dithiophene-co-3-fluorothieno[3,4-b]thiophene-2-carboxylate]) was coated on MOF/SiO 2 and two electrodes on the semiconducting film were deposited sequentially, MOF-based OFETs were fabricated successfully. By controlling the LPE cycles of SURMOF HKUST-1 (also named Cu 3 (BTC) 2 , BTC = 1,3,5-benzenetricarboxylate), the performance of the HKUST-1/SiO 2 -based OFETs showed high charge mobility and low threshold voltage. This first report on the application of MOF thin film in OFETs will offer an effective approach for designing a new kind of materials for the OFET application.

  14. Brookite TiO2 thin film epitaxially grown on (110) YSZ substrate by atomic layer deposition.

    Science.gov (United States)

    Kim, Dai-Hong; Kim, Won-Sik; Kim, Sungtae; Hong, Seong-Hyeon

    2014-08-13

    Epitaxial brookite TiO2 (B-TiO2) film was deposited on (110) yttria-stabilized zirconia (YSZ) substrate using plasma-enhanced atomic layer deposition, and its structural, optical, and gas sensing properties were investigated. As-deposited TiO2 film was a pure brookite and (120) oriented. The determined in-plane orientation relationships were [21̅0]B-TiO2//[1̅10]YSZ and [001]B-TiO2 //[001]YSZ. The B-TiO2 film showed ∼70% transmittance and the optical band gap energy was 3.29 eV. The B-TiO2 film-based gas sensor responded to H2 gas even at room temperature and the highest magnitude of the gas response was determined to be ∼150 toward 1000 ppm of H2/air at 150 °C. In addition, B-TiO2 sensor showed a high selectivity for H2 against CO, EtOH, and NH3.

  15. Structure and Properties of Epitaxial Dielectrics on gallium nitride

    Science.gov (United States)

    Wheeler, Virginia Danielle

    GaN is recognized as a possible material for metal oxide semiconductor field effect transistors (MOSFETs) used in high temperature, high power and high speed electronic applications. However, high gate leakage and low device breakdown voltages limit their use in these applications. The use of high-kappa dielectrics, which have both a high permittivity (ε) and high band gap energy (Eg), can reduce the leakage current density that adversely affects MOS devices. La2O3 and Sc2O 3 are rare earth oxides with a large Eg (6.18 eV and 6.3 eV respectively) and a relatively high ε (27 and 14.1 respectively), which make them good candidates for enhancing MOSFET performance. Epitaxial growth of oxides is a possible approach to reducing leakage current and Fermi level pinning related to a high density of interface states for dielectrics on compound semiconductors. In this work, La2O3 and Sc2O 3 were characterized structurally and electronically as potential epitaxial gate dielectrics for use in GaN based MOSFETs. GaN surface treatments were examined as a means for additional interface passivation and influencing subsequent oxide formation. Potassium persulfate (K2(SO4)2) and potassium hydroxide (KOH) were explored as a way to achieve improved passivation and desired surface termination for GaN films deposited on sapphire substrates by metal organic chemical vapor deposition (MOCVD). X-ray photoelectron spectroscopy (XPS) showed that KOH left a nitrogen-rich interface, while K2(SO 4)2 left a gallium-rich interface, which provides a way to control surface oxide formation. K2(SO4)2 exhibited a shift in the O1s peak indicating the formation of a gallium-rich GaOx at the surface with decreased carbon contaminants. GaO x acts as a passivating layer prior to dielectric deposition, which resulted in an order of magnitude reduction in leakage current, a reduced hysteresis window, and an overall improvement in device performance. Furthermore, K2(SO4)2 resulted in an additional 0.4 eV of

  16. Design and fabrication of enhanced lateral growth for dislocation reduction in GaN using nanodashes

    Science.gov (United States)

    Le Boulbar, E. D.; Priesol, J.; Nouf-Allehiani, M.; Naresh-Kumar, G.; Fox, S.; Trager-Cowan, C.; Šatka, A.; Allsopp, D. W. E.; Shields, P. A.

    2017-05-01

    The semiconductor gallium nitride is the material at the centre of energy-efficient solid-state lighting and is becoming increasingly important in high-power and high-frequency electronics. Reducing the dislocation density of gallium nitride planar layers is important for improving the performance and reliability of devices, such as light-emitting diodes and high-electron-mobility transistors. The patterning of selective growth masks is one technique for forcing a three-dimensional growth mode in order to control the propagation of threading defects to the active device layers. The morphology of the three-dimensional growth front is determined by the relative growth rates of the different facets that are formed, and for GaN is typically limited by the slow-growing {1 -1 0 1} facets. We demonstrate how the introduction of nanodash growth windows can be oriented in an array to preserve fast-growing {1 1 -2 2} facets at the early stage of growth to accelerate coalescence of three-dimensional structures into a continuous GaN layer. Cathodoluminescence and Electron Channelling Contrast Imaging methods, both used to measure the threading dislocation density, reveal that the dislocations are organised and form a distinctive pattern according to the underlying mask. By optimising the arrangement of nanodashes and the nanodash density, the threading dislocation density of GaN on sapphire epilayers can be reduced significantly from 109 cm-2 to 3.0 × 107 cm-2. Raman spectroscopy, used to monitor the strain in the overgrown GaN epilayers, shows that the position of the GaN E2H phonon mode peak was reduced as the dash density increases for a sample grown via pendeo-epitaxy whilst no obvious change was recorded for a sample grown via more conventional epitaxial lateral overgrowth. These results show how growth mask design can be used to circumvent limitations imposed by the growth dynamics. Moreover, they have revealed a greater understanding of the influence of the growth

  17. High Throughput Characterization of Epitaxially Grown Single-Layer MoS2

    Directory of Open Access Journals (Sweden)

    Foad Ghasemi

    2017-03-01

    Full Text Available The growth of single-layer MoS2 with chemical vapor deposition is an established method that can produce large-area and high quality samples. In this article, we investigate the geometrical and optical properties of hundreds of individual single-layer MoS2 crystallites grown on a highly-polished sapphire substrate. Most of the crystallites are oriented along the terraces of the sapphire substrate and have an area comprised between 10 µm2 and 60 µm2. Differential reflectance measurements performed on these crystallites show that the area of the MoS2 crystallites has an influence on the position and broadening of the B exciton while the orientation does not influence the A and B excitons of MoS2. These measurements demonstrate that differential reflectance measurements have the potential to be used to characterize the homogeneity of large-area chemical vapor deposition (CVD-grown samples.

  18. Epitaxial growth of an antireflective, conductive, graded index ITO nanowire layer

    Directory of Open Access Journals (Sweden)

    Colm eO'Dwyer

    2013-10-01

    Full Text Available Nanoporous and nanostructured films, assemblies and arrangements are important from an applied point of view in microelectronics, photonics and optical materials. The ability to minimize reflection, control light output and use contrast and variation of the refractive index to modify photonic characteristics can provide routes to enhanced photonic crystal devices, omnidirectional reflectors, antireflection coatings and broadband absorbing materials. This work shows how multiscale branching of defect-free ITO NWs grown as a layer with a graded refractive index improves antireflection properties and shifts the transparency window into the near-infrared (NIR. The measurements confirm the structural quality and growth mechanism of the NW layer without any heterogeneous seeding for NW growth. Optical reflectance measurements confirm broadband antireflection down to <5% between 1.3-1.6 um which is tunable with the NW density. The work also outlines how the suppression of the Burstein-Moss shifts using refractive index variation allows transparency in a conductive NW layer into NIR range.

  19. Effect of compressive and tensile strain on misfit dislocation injection in SiGe epitaxial layers

    Energy Technology Data Exchange (ETDEWEB)

    Wegscheider, W. [Walter Schottky Institut, Garching (Germany); Cerva, H. [Siemens AG, Research Lab., Muenchen (Germany)

    1993-05-01

    The relaxation behavior of short-period Si/Ge superlattices and Si{sub x}Ge{sub 1-x} alloy layers under compressive and tensile strain field is compared experimentally by means of transmission electron microscopy as well as theoretically on ethebasis of a half-loop dislocation nucleation mode. It was found that misfit dislocations in tensily strained layers grown on Ge(001) substrates are imperfect and of the 90{degrees} Shockley type provided some critical misfit f{sub c} is exceeded. Subsequent nucleation and glide of these partial dislocations on adjacent (111) glide planes leads to the formation of stacking faults and microtwins. In the low misfit regime (flayers which experience a compressive strain field within the (001) growth plane are generally of the 60{degrees} type. In this case the critical thickness for coherent growth is found to be substantially enlarged with respect to the inverse strain situation where microtwin formation occurs. 30 refs., 8 figs.

  20. Epitaxy of Polar Oxides and Semiconductors

    Science.gov (United States)

    Shelton, Christopher Tyrel

    Integrating polar oxide materials with wide-bandgap nitride semiconductors offers the possibility of a tunable 2D carrier gas (2DCG) - provided defect densities are low and interfaces are abrupt. This dissertation investigates a portion of the synthesis science necessary to produce a "semiconductor-grade" interface between these highly dissimilar materials. A significant portion of this work is aligned with efforts to engineer a step-free GaN substrate to produce single in-plane oriented rocksalt oxide films. Initially, we explore the homoepitaxial MOCVD growth conditions necessary to produce highquality GaN films on ammonothermally grown substrates. Ammono substrates are only recently available for purchase and are the market leader in low-dislocation density material. Their novelty requires development of an understanding of morphology trade-offs in processing space. This includes preservation of the epi-polished surface in aggressive MOCVD environments and an understanding of the kinetic barriers affecting growth morphologies. Based on several factors, it was determined that GaN exhibits an 'uphill' diffusion bias that may likely be ascribed to a positive Ehrlich-Schwoebel (ES) barrier. This barrier should have a stabilizing effect against step-bunching but, for many growth conditions, regular step bunching was observed. One possible explanation for the step-bunching instability is the presence of impurities. Experimentally, conditions which incorporate more carbon into GaN homoepitaxial layers are correlated with step-bunching while conditions that suppress carbon produce bilayer stepped morphologies. These observations lead us to the conclusion that GaN homoepitaxial morphology is a competition between impurity induced step-bunching and a stabilizing diffusion bias due to a positive ES barrier. Application of the aforementioned homoepitaxial growth techniques to discrete substrate regions using selected- and confined area epitaxy (SAE,CAE) produces some

  1. Epitaxial Graphene Surface Preparation for Atomic Layer Deposition of Al2O3

    Science.gov (United States)

    2011-06-01

    effect transistors ( FETs ), and to meet the challenge of scaling devices to small sizes ( nm). In addition, AlN is a suitable dielectric for...using a Cambridge NanoTech, Inc. Savannah 200 thermal ALD system. The sources were electronic- grade TMA (Sigma-Aldrich) and triply distilled H2O which...most layer of EG grown on the C-face of SiC is doped heav- ily p-type. In addition, Lohmann et al.31 also presented data supporting the mechanism of

  2. Strain relaxation during solid-phase epitaxial crystallisation of Ge{sub x}Si{sub 1-x} alloy layers with depth dependent G{sub e} compositions

    Energy Technology Data Exchange (ETDEWEB)

    Wong, Wahchung; Elliman, R.G.; Kringhoj, P. [Australian National Univ., Canberra, ACT (Australia). Research School of Physical Sciences

    1993-12-31

    The solid-phase epitaxial crystallisation of depth dependent Ge{sub x}Si{sub lx} alloy layers produced by implanting Ge into Si substrates was studied. In-situ monitoring was done using time-resolved reflectivity (TRR) whilst post-anneal defect structures were characterised by Rutherford backscattering and channeling spectrometry (RBS-C) and transmission electron microscopy (TEM). Particular attention was directed at Ge concentrations above the critical concentration for the growth of fully strained layers. Strain relief is shown to be correlated with a sudden reduction in crystallisation velocity caused by roughening of the crystalline/amorphous interface. 11 refs., 1 tab., 2 figs.

  3. Growth evolution and pendeo-epitaxy of non-polar AlN and GaN thin films on 4H SiC (1 1 2¯ 0)

    Science.gov (United States)

    Bishop, S. M.; Park, J.-S.; Gu, J.; Wagner, B. P.; Reitmeier, Z. J.; Batchelor, D. A.; Zakharov, D. N.; Liliental-Weber, Z.; Davis, R. F.

    2007-03-01

    The initial and subsequent stages of growth of AlN on 4H-SiC (1 1 2¯ 0) and GaN on AlN (1 1 2¯ 0) have been investigated using atomic force microscopy and X-ray photoelectron spectroscopy. The AlN nucleated and grew via the Stranski-Krastanov mode. Densely packed, [0 0 0 1]-oriented individual islands were observed at 10 nm. Additional deposition resulted in the gradual reorientation of the growth microstructure along the [1 1¯ 0 0]. GaN formed via the Volmer-Weber mode with rapid growth of islands along the [1 1¯ 0 0] to near surface coverage at a thickness of 2 nm. Continued deposition resulted in both faster vertical growth along [1 1 2¯ 0] relative to the lateral growth along [0 0 0 1] and a [1 1¯ 0 0]-oriented microstructure containing rows of GaN. Fully dense GaN films developed between 100 and 250 nm of growth, and the preferred in-plane orientation changed to [0 0 0 1]. Lateral growth of GaN films reduced the dislocation density from ˜4×10 10 to ˜2×10 8 cm -2. The high concentration of stacking faults (˜10 6 cm -1) was also reduced two orders of magnitude.

  4. Epitaxial growth of GaSb on V-grooved Si (001) substrates with an ultrathin GaAs stress relaxing layer

    Science.gov (United States)

    Li, Qiang; Lai, Billy; Lau, Kei May

    2017-10-01

    We report epitaxial growth of GaSb nano-ridge structures and planar thin films on V-groove patterned Si (001) substrates by leveraging the aspect ratio trapping technique. GaSb was deposited on {111} Si facets of the V-shaped trenches using metal-organic chemical vapor deposition with a 7 nm GaAs growth initiation layer. Transmission electron microscopy analysis reveals the critical role of the GaAs layer in providing a U-shaped surface for subsequent GaSb epitaxy. A network of misfit dislocations was uncovered at the GaSb/GaAs hetero-interface. We studied the evolution of the lattice relaxation as the growth progresses from closely pitched GaSb ridges to coalesced thin films using x-ray diffraction. The omega rocking curve full-width-at-half-maximum of the resultant GaSb thin film is among the lowest values reported by molecular beam epitaxy, substantiating the effectiveness of the defect necking mechanism. These results thus present promising opportunities for the heterogeneous integration of devices based on 6.1 Å family compound semiconductors.

  5. Chemical-Mechanical Lift-Off Process for InGaN Epitaxial Layers

    Science.gov (United States)

    Lin, Ming-Shiou; Lin, Chia-Feng; Huang, Wan-Chun; Wang, Guei-Miao; Shieh, Bing-Cheng; Dai, Jing-Jie; Chang, Shou-Yi; Wuu, D. S.; Liu, Po-Liang; Horng, Ray-Hua

    2011-06-01

    An InGaN-based light-emitting diode (LED) structure was separated from a GaN/sapphire structure by inserting sacrificial Si-doped InGaN/GaN superlattice layers through a chemical-mechanical lift-off (CMLO) process. The CMLO process consisted of a band-gap-selective photoelectrochemical lateral wet etching process and a mechanical lift-off process. A lower elastic modulus and hardness of the lateral-etched LED structure were measured compared with the conventional LED structure, which indicated a weak mechanical property of the treated LED structure. The photoluminescence blue-shift phenomenon and the Raman redshift phenomenon indicated that the compressive strain from the bottom GaN/sapphire structure was released through the CMLO process.

  6. Electron mobility enhancement in metalorganic-vapor-phase-epitaxy-grown InAlN high-electron-mobility transistors by control of surface morphology of spacer layer

    Science.gov (United States)

    Yamada, Atsushi; Ishiguro, Tetsuro; Kotani, Junji; Nakamura, Norikazu

    2018-01-01

    We demonstrated low-sheet-resistance metalorganic-vapor-phase-epitaxy-grown InAlN high-electron-mobility transistors using AlGaN spacers with excellent surface morphology. We systematically investigated the effects of AlGaN spacer growth conditions on surface morphology and electron mobility. We found that the surface morphology of InAlN barriers depends on that of AlGaN spacers. Ga desorption from AlGaN spacers was suppressed by increasing the trimethylaluminum (TMA) supply rate, resulting in the small surface roughnesses of InAlN barriers and AlGaN spacers. Moreover, we found that an increase in the NH3 supply rate also improved the surface morphologies of InAlN barriers and AlGaN spacers as long as the TMA supply rate was high enough to suppress the degradation of GaN channels. Finally, we realized a low sheet resistance of 185.5 Ω/sq with a high electron mobility of 1210 cm2 V‑1 s‑1 by improving the surface morphologies of AlGaN spacers and InAlN barriers.

  7. Soft epitaxy of nanocrystal superlattices

    National Research Council Canada - National Science Library

    Rupich, Sara M; Castro, Fernando C; Irvine, William T M; Talapin, Dmitri V

    2014-01-01

    .... NC epitaxy reveals an exceptional strain tolerance. It follows a universal island size scaling behaviour and shows a strain-driven transition from layer-by-layer to Stranski-Krastanov growth with non-trivial island height statistics...

  8. Fabrication methods for InGaAsP/GaAs visible laser structure with AlGaAs burying layers grown by liquid-phase epitaxy

    Science.gov (United States)

    Takahashi, N. Shin-Ichi, N.; Fukushima, Akira; Sasaki, Tatsuya; Ishikawa, Joji; Ninomiya, Kazuhisa; Narui, Hironobu; Kurita, Shoichi

    1986-02-01

    Liquid-phase-epitaxial (LPE) growth of AlGaAs layers has been used in fabricating InGaAsP buried heterostructure visible lasers on GaAs substrate. InGaAsP/InGaAsP double heterostructure wafers were grown on the p-type GaAs substrates by means of the melt-back method prior to the LPE growth for eliminating phosphorus contamination. An SiO2 film mask was deposited on the epitaxial wafer surface by the rf sputtering, and photoetched with stripes of 7-10 μm width in the direction. After etching to the first p-InGaAsP cladding layer with a 3% Br-methanol solution, the second LPE growth of n-AlGaAs and p-GaAs layers was carried out. The InGaAsP active region is entirely surrounded by the InGaAsP cladding layers and the AlGaAs burying layer, therefore, it becomes possible to provide both lateral and vertical carrier and optical confinements. I-L characteristics were measured at room temperature under pulsed operation, but the lasing action was not obtained. The peak wavelength of the electroluminescence was 785 nm. The transverse mode behavior was analyzed by means of the effective refractive index approximation. And it seemed that this buried heterostructure is suitable for the transverse mode control of InGaAsP visible laser diodes.

  9. Scanning proximal microscopy study of the thin layers of silicon carbide-aluminum nitride solid solution manufactured by fast sublimation epitaxy

    Directory of Open Access Journals (Sweden)

    Tománek P.

    2013-05-01

    Full Text Available The objective of the study is a growth of SiC/(SiC1−x(AlNx structures by fast sublimation epitaxy of the polycrystalline source of (SiC1−x(AlNx and their characterisation by proximal scanning electron microscopy and atomic force microscopy. For that purpose optimal conditions of sublimation process have been defined. Manufactured structures could be used as substrates for wide-band-gap semiconductor devices on the basis of nitrides, including gallium nitride, aluminum nitride and their alloys, as well as for the production of transistors with high mobility of electrons and also for creation of blue and ultraviolet light emitters (light-emitted diodes and laser diodes. The result of analysis shows that increasing of the growth temperature up to 2300 K allows carry out sublimation epitaxy of thin layers of aluminum nitride and its solid solution.

  10. Orientation-dependent physical properties of layered perovskite La1.3Sr1.7Mn2O7 epitaxial thin films

    Science.gov (United States)

    Niu, Li-Wei; Guo, Bing; Chen, Chang-Le; Luo, Bing-Cheng; Dong, Xiang-Lei; Jin, Ke-Xin

    2017-04-01

    In this paper, the resistivity and magnetization of orientation-engineered layered perovskite La1.3Sr1.7Mn2O7 epitaxial thin films have been investigated. Epitaxial thin films were deposited on single-crystalline LaAlO3 (LAO) (001), (110) and (111) substrates by pulse laser deposition (PLD) technique. It is found that only the (100)-oriented thin film performs insulator behavior, whereas the (110) and (111)-oriented thin films exhibit obvious metal-insulator transition at 70 K and between 85 and 120 K, respectively. Moreover, the same spin freezing temperature and different spin-glass-like transition temperatures have been observed in various oriented films. The observed experimental results were discussed according to the electron-transport mechanism and spin dynamics.

  11. Porosity-induced relaxation of strains in GaN layers studied by means of micro-indentation and optical spectroscopy

    KAUST Repository

    Najar, Adel

    2012-05-04

    We report the fabrication of porous GaNnanostructures using UV-assisted electroless etching of bulk GaN layer grown on c-plane sapphire substrate in a solution consisting of HF:CH3OH:H2O2. The morphology of the porous GaNnanostructures was characterized for different etching intervals using high resolution scanning electron microscopy. The geometry and size of resultant pores do not appear to be affected by the etching time; however, the pore density was augmented for longer etching time. Micro-indentation tests were carried out to quantify the indentation modulus for different porous GaNnanostructures. Our results reveal a relationship between the elastic properties and the porosity kinetics, i.e., a decrease of the elastic modulus was observed with increasing porosity. The photoluminescence(PL) and Raman measurements carried out at room temperature for the etched samples having a high degree of porosity revealed a strong enhancement in intensity. Also, the peak of the PL wavelength was shifted towards a lower energy. The high intensity of PL was correlated to an increase of scattered photons within the porous media and to the reduction of the dislocation density.

  12. Photoreflectance studies of optical transitions in cubic GaN grown on GaAs(0 0 1) substrates

    Science.gov (United States)

    Noriega, O. C.; Tabata, A.; Soares, J. A. N. T.; Rodrigues, S. C. P.; Leite, J. R.; Ribeiro, E.; Fernandez, J. R. L.; Meneses, E. A.; Cerdeira, F.; As, D. J.; Schikora, D.; Lischka, K.

    2003-05-01

    The optical properties of cubic GaN epitaxial layers were investigated by modulated photoreflectance (PR) and photoluminescence in the temperature interval from 5 to 300 K. The epilayers were grown on GaAs(0 0 1) substrates by molecular beam epitaxy using a nitrogen RF-activated plasma source. The PR spectra show a transition which is well fitted using the third-derivative functional form of the unperturbed dielectric function, which we interpret as band-to-band transition. Our results allow determination of the temperature dependence of the main gap of c-GaN and give insights into the residual strain in the film, as well as allow us to estimate the binding energy of the complex formed by an exciton bound to a neutral acceptor.

  13. In situ analysis of strain relaxation during catalyst-free nucleation and growth of GaN nanowires.

    Science.gov (United States)

    Knelangen, M; Consonni, V; Trampert, A; Riechert, H

    2010-06-18

    Strain relaxation mechanisms occurring during self-induced growth of nitride nanowires are investigated by in situ reflection high-energy electron diffraction and ex situ high-resolution transmission electron microscopy. Epitaxial GaN nanowires nucleate on an AlN buffer layer under highly nitrogen-rich conditions via the initial formation of coherently strained three-dimensional islands according to the Volmer-Weber growth mechanism. The epitaxial strain relief in these islands occurs by two different processes. Initially, strain is elastically relieved via several shape transitions. Subsequently, plastic relaxation takes place through the formation of a misfit dislocation at the GaN/AlN interface. At the same time, a final shape transition to fully relaxed nanowires occurs.

  14. Epitaxial Growth of Two-Dimensional Layered Transition-Metal Dichalcogenides: Growth Mechanism, Controllability, and Scalability

    KAUST Repository

    Li, Henan

    2017-07-06

    Recently there have been many research breakthroughs in two-dimensional (2D) materials including graphene, boron nitride (h-BN), black phosphors (BPs), and transition-metal dichalcogenides (TMDCs). The unique electrical, optical, and thermal properties in 2D materials are associated with their strictly defined low dimensionalities. These materials provide a wide range of basic building blocks for next-generation electronics. The chemical vapor deposition (CVD) technique has shown great promise to generate high-quality TMDC layers with scalable size, controllable thickness, and excellent electronic properties suitable for both technological applications and fundamental sciences. The capability to precisely engineer 2D materials by chemical approaches has also given rise to fascinating new physics, which could lead to exciting new applications. In this Review, we introduce the latest development of TMDC synthesis by CVD approaches and provide further insight for the controllable and reliable synthesis of atomically thin TMDCs. Understanding of the vapor-phase growth mechanism of 2D TMDCs could benefit the formation of complicated heterostructures and novel artificial 2D lattices.

  15. Magnetic Characteristics of Mn-Implanted GaN Nanorods Followed by Thermal Annealing

    Directory of Open Access Journals (Sweden)

    Im Taek Yoon

    2012-01-01

    Full Text Available We have investigated the magnetic and optical properties of dislocation-free vertical GaN nanorods with diameters of 150 nm grown on (111 Si substrates by radio-frequency plasma-assisted molecular-beam epitaxy followed by Mn ion implantation and annealing. The GaN nanorods are fully relaxed and have a very good crystal quality characterized by extremely strong and narrow photoluminescence excitonic lines near 3.47 eV. For GaMnN nanorods, it can be concluded that the ferromagnetic property of GaMnN nanorod with a Curie temperature over 300 K is associated with the formation of Mn4Si7 magnetic phase which results from the effects of magnetic and structural disorder introduced by a random incorporation and inhomogeneous distribution of Mn atoms in the porous layer between the nanorods that form precipitates in the Si substrate before or during the annealing step amongst the GaN nanorods.

  16. High-pressure crystallization of GaN for electronic applications

    CERN Document Server

    Grzegory, I

    2002-01-01

    The results obtained with the use of pressure-grown GaN single-crystalline substrates allow us to draw the following conclusions important for the construction of In-free UV light emitting diodes and lasers and InGaN-based high-power blue lasers. (1) The application of pressure-grown GaN single-crystalline substrates allows us to grow near-dislocation-free layer structures by both metal- organic chemical vapour deposition and molecular beam epitaxy. (2) The elimination of dislocations leads to highly efficient UV emission from GaN and GaN/AlGaN quantum wells, which is impossible for strongly dislocated structures grown on sapphire. (3) At high excitations (e.g. in lasers), dislocations are also effective non-radiative recombination centres in InGaN-containing structures, so the elimination of these defects is crucial for better performance of blue lasers. In this paper, the optical and structural properties of the near-dislocation-free GaN-based structures leading to the above conclusions are discussed.

  17. High uniform growth of 4-inch GaN wafer via flow field optimization by HVPE

    Science.gov (United States)

    Cheng, Yutian; Liu, Peng; Wu, Jiejun; Xiang, Yong; Chen, Xinjuan; Ji, Cheng; Yu, Tongjun; Zhang, Guoyi

    2016-07-01

    The uniformity of flow field inner the reactor plays a crucial role for hydride vapor phase epitaxy (HVPE) crystal growth and its more important for large scale substrate. A new nozzle structure was designed by adding a push and dilution (PD) gas pipe in the center of gas channels for a 4-inch HVPE (PD-HVPE) system. Experimental results showed that the thickness inhomogeneity of 46 μm 4-inch GaN layer could reach ±1.8% by optimizing PD gas, greatly improved from ±14% grown with conventional nozzle. The simulations of the internal flow field were consistent with our experiment, and the enhancement in uniformity should be attributed to the redistribution of GaCl and NH3 upon the wafer induced by PD pipe. The full width at half maximum (FWHM) of X-ray diffraction rocking curves for the 4-inch GaN film were about 224 and 200 arcsec for (002) and (102) reflection. The dislocation density of as-grown GaN was about 6.4×107 cm-2.

  18. Basic Equations for the Modeling of Gallium Nitride (gan) High Electron Mobility Transistors (hemts)

    Science.gov (United States)

    Freeman, Jon C.

    2003-01-01

    Gallium nitride (GaN) is a most promising wide band-gap semiconductor for use in high-power microwave devices. It has functioned at 320 C, and higher values are well within theoretical limits. By combining four devices, 20 W has been developed at X-band. GaN High Electron Mobility Transistors (HEMTs) are unique in that the two-dimensional electron gas (2DEG) is supported not by intentional doping, but instead by polarization charge developed at the interface between the bulk GaN region and the AlGaN epitaxial layer. The polarization charge is composed of two parts: spontaneous and piezoelectric. This behavior is unlike other semiconductors, and for that reason, no commercially available modeling software exists. The theme of this document is to develop a self-consistent approach to developing the pertinent equations to be solved. A Space Act Agreement, "Effects in AlGaN/GaN HEMT Semiconductors" with Silvaco Data Systems to implement this approach into their existing software for III-V semiconductors, is in place (summer of 2002).

  19. Molecular beam epitaxy of cubic III-nitrides on GaAs substrates

    Energy Technology Data Exchange (ETDEWEB)

    As, D.J.; Schikora, D.; Lischka, K. [Dept. of Physics, Univ. of Paderborn, Paderborn (Germany)

    2003-07-01

    Molecular beam epitaxy has successfully been used to grow crystalline layers of group III-nitrides (GaN, AlN and InN) with cubic (zinc-blende) structure on GaAs substrates. In this article, we discuss these efforts that, despite inherent difficulties due to the metastability of the c-III nitrides, led to substantial improvements of the structural, electrical and optical quality of these wide gap semiconductors. We review experimental work concerned with the epitaxy of c-GaN and the control of the growth process in-situ, the important issue of p- and n-type doping of c-GaN and investigations of the structural and optical properties of c-InGaN and c-AlGaN. (orig.)

  20. Enhancement of L10 ordering with the c-axis perpendicular to the substrate in FePt alloy film by using an epitaxial cap-layer

    Directory of Open Access Journals (Sweden)

    Mitsuru Ohtake

    2017-05-01

    Full Text Available FePt alloy thin films with cap-layers of MgO or C are prepared on MgO(001 single-crystal substrates by using a two-step method consisting of low-temperature deposition at 200 °C followed by high-temperature annealing at 600 °C. The FePt film thickness is fixed at 10 nm, whereas the cap-layer thickness is varied from 1 to 10 nm. The influences of cap-layer material and cap-layer thickness on the variant structure and the L10 ordering are investigated. Single-crystal FePt(001 films with disordered fcc structure (A1 grow epitaxially on the substrates at 200 °C. Single-crystal MgO(001 cap-layers grow epitaxially on the FePt films, whereas the structure of C cap-layers is amorphous. The phase transformation from A1 to L10 occurs when the films are annealed at 600 °C. The FePt films with MgO cap-layers thicker than 2 nm consist of L10(001 variant with the c-axis perpendicular to the substrate surface, whereas those with C cap-layers involve small volumes of L10(100 and (010 variants with the c-axis lying in the film plane. The in-plane and the out-of-plane lattices are respectively more expanded and contracted in the continuous-lattice MgO/FePt/MgO structure due to accommodations of misfits of FePt film with respect to not only the MgO substrate but also the MgO cap-layer. The lattice deformation promotes phase transformation along the perpendicular direction and L10 ordering. The FePt films consisting of only L10(001 variant show strong perpendicular magnetic anisotropies and low in-plane coercivities. The present study shows that an introduction of epitaxial cap-layer is effective in controlling the c-axis perpendicular to the substrate surface.

  1. Integrated Production of Ultra-Low Defect GaN Films and Devices for High-Power Amplifiers Project

    Data.gov (United States)

    National Aeronautics and Space Administration — High quality GaN epitaxial films are key to current efforts for development of both high-power/high-speed electronic devices and optoelectronic devices. In fact,...

  2. Integrated Production of Ultra-Low Defect GaN Films and Devices for High-Power Amplifiers Project

    Data.gov (United States)

    National Aeronautics and Space Administration — High quality GaN epitaxial films are one of the keys to current efforts for development of both high-power/high-speed electronic devices and optoelectronic devices....

  3. Growth of ZnO and GaN Films

    Science.gov (United States)

    Chang, J.; Hong, S.-K.; Matsumoto, K.; Tokunaga, H.; Tachibana, A.; Lee, S. W.; Cho, M.-W.

    . Zinc oxide (ZnO) and gallium nitride (GaN) are wide bandgap semi conductors applicable to light emitting diodes (LEDs) and laser diodes (LDs) with wavelengths ranging from ultraviolet to blue light. Now ZnO and GaN are key ma terials for optoelectronic device applications and their applications are being rapidly expanded to lots of other technology including electronics, biotechnology, nanotech-nology, and fusion technology among all these. As a fundamental starting point for the development of this new technique, epitaxy of ZnO and GaN films is one of the most important key technology. Hence, development of the growth technique for high quality epitaxial films is highly necessary. Among the various kinds of epi taxy technique for semiconductor films developed so far, physical vapor deposition (PVD)-based epitaxy technique has been revealed to be the appropriate way for the high quality ZnO film and related alloy growths, while chemical vapor deposition (CVD)-based epitaxy technique has been proved to be the best method for the high quality GaN film and related alloy growths.

  4. Dislocation generation in GaN heteroepitaxy

    Science.gov (United States)

    Wu, X. H.; Fini, P.; Tarsa, E. J.; Heying, B.; Keller, S.; Mishra, U. K.; DenBaars, S. P.; Speck, J. S.

    1998-06-01

    In this work, we study the microstructural evolution, with particular emphasis on threading dislocation (TD) generation, in the two-step metal-organic chemical vapor deposition (MOCVD) of GaN on sapphire. The MOCVD growths were carried out at atmospheric pressure in a horizontal two-flow reactor. Nominally, 200 Å thick nucleation layers (NL) were deposited at temperatures in the range 525-600°C followed by high temperature (HT) growth at 1060-1080°C. Throughout the different stages of growth, the microstructure was studied by transmission electron microscopy (TEM) and atomic force microscopy (AFM). Two growth conditions were closely studied: brief pre-growth ammonia exposure of the sapphire (`Material A') and extensive pre-growth ammonia exposure of the sapphire (`Material B'). The as-grown Material B NL has a ˜25 Å hexagonal GaN wetting layer followed by predominantly (1 1 1) oriented cubic GaN. After HT exposure, Material B NL predominantly transforms to hexagonal GaN and has TDs. These TDs propagate into the HT GaN and lead to a TD density of 2×10 10 after 1 μm of HT growth. Material A NLs, before and after HT exposure, have rough morphologies and a high-degree-of-stacking disorder (predominantly (1 1 1) oriented cubic GaN). On Material A NLs, The HT GaN grows by a coarse island mechanism in which the GaN laterally overgrows the NL without generating TDs. Stacking disorder and misorientation between the HT hexagonal GaN and the NL islands is accommodated either by Shockley or Frank partial dislocations or local strain. The majority of TDs are subsequently generated at the coalescence of the HT islands.

  5. Solution-phase epitaxial growth of noble metal nanostructures on dispersible single-layer molybdenum disulfide nanosheets.

    Science.gov (United States)

    Huang, Xiao; Zeng, Zhiyuan; Bao, Shuyu; Wang, Mengfei; Qi, Xiaoying; Fan, Zhanxi; Zhang, Hua

    2013-02-05

    Compared with the conventional deposition techniques used for the epitaxial growth of metallic structures on a bulk substrate, wet-chemical synthesis based on the dispersible template offers several advantages, including relatively low cost, high throughput, and the capability to prepare metal nanostructures with controllable size and morphology. Here we demonstrate that the solution-processable two-dimensional MoS(2) nanosheet can be used to direct the epitaxial growth of Pd, Pt and Ag nanostructures at ambient conditions. These nanostructures show the major (111) and (101) orientations on the MoS(2)(001) surface. Importantly, the Pt-MoS(2) hybrid nanomaterials exhibit much higher electrocatalytic activity towards the hydrogen evolution reaction compared with the commercial Pt catalysts with the same Pt loading. We believe that nanosheet-templated epitaxial growth of nanostructures via wet-chemical reaction is a promising strategy towards the facile and high-yield production of novel functional materials.

  6. P-type doping of GaN

    Energy Technology Data Exchange (ETDEWEB)

    Wong, Raechelle Kimberly [Univ. of California, Berkeley, CA (United States)

    2000-04-01

    After implantation of As, As + Be, and As + Ga into GaN and annealing for short durations at temperatures as high as 1500 C, the GaN films remained highly resistive. It was apparent from c-RBS studies that although implantation damage did not create an amorphous layer in the GaN film, annealing at 1500 C did not provide enough energy to completely recover the radiation damage. Disorder recovered significantly after annealing at temperatures up to 1500 C, but not completely. From SIMS analysis, oxygen contamination in the AIN capping layer causes oxygen diffusion into the GaN film above 1400 C. The sapphire substrate (A1203) also decomposed and oxygen penetrated into the backside of the GaN layer above 1400 C. To prevent donor-like oxygen impurities from the capping layer and the substrate from contaminating the GaN film and compensating acceptors, post-implantation annealing should be done at temperatures below 1500 C. Oxygen in the cap could be reduced by growing the AIN cap on the GaN layer after the GaN growth run or by depositing the AIN layer in a ultra high vacuum (UHV) system post-growth to minimize residual oxygen and water contamination. With longer annealing times at 1400 C or at higher temperatures with a higher quality AIN, the implantation drainage may fully recover.

  7. Ultraviolet light emitting diodes by ammonia molecular beam epitaxy on metamorphic (KAUST Repository

    Young, Erin C.

    2015-09-01

    © 2015. In this paper we demonstrate ultraviolet (UV) light emitting diodes (LEDs) grown on metamorphic AlGaN buffers on freestanding GaN (202-1) substrates by ammonia assisted molecular beam epitaxy (MBE). Misfit and related threading dislocations were confined to the stress relaxed, compositionally graded buffer layers, and single quantum well devices emitting at 355, 310 and 274. nm were grown on top of the graded buffers. The devices showed excellent structural and electrical (I-. V) characteristics.

  8. Effect of growth polarity on vacancy defect and impurity incorporation in dislocation-free GaN

    NARCIS (Netherlands)

    Tuomisto, F.; Saarinen, K.; Lucznik, B.; Grzegory, I.; Teisseyre, H.; Suski, T.; Porowski, S.; Hageman, P.R.; Likonen, J.

    2005-01-01

    We have used positron annihilation, secondary ion mass spectrometry, and photoluminescence to study the point defects in GaN grown by hydride vapor phase epitaxy (HVPE) on GaN bulk crystals. The results show that N polar growth incorporates many more donor and acceptor type impurities and also Ga

  9. Critical thickness of GaN on AlN: impact of growth temperature and dislocation density

    Science.gov (United States)

    Sohi, P.; Martin, D.; Grandjean, N.

    2017-07-01

    Critical thickness and strain relaxation of c-plane GaN layers grown by molecular beam epitaxy on AlN were studied as a function of growth temperature and threading dislocation density (TDD). For this purpose we used AlN/sapphire templates and AlN single crystals with TDDs of ˜109 cm-2 and ˜103 cm-2, respectively. Whereas at high growth temperature (900 °C) the critical thickness for plastic relaxation is only 3 monolayers (MLs) for both substrates, this value drastically increases when decreasing the growth temperature. It reaches ˜30 MLs when GaN is deposited at 750 °C on AlN single crystals. We also observed that the strain relaxation rate strongly depends on TDD. These results exemplify the lack of efficient gliding planes in III-nitrides when grown along the c-axis, which, combined with low kinetics, allows for plastic relaxation to be frozen out. Achieving pseudomorphic GaN layers on AlN is of interest for two-dimensional electron gases based on AlN/GaN/AlN heterostructures lattice-matched to AlN single crystal substrates.

  10. Ultra-low voltage resistive switching of HfO2 buffered (001) epitaxial NiO films deposited on metal seed layers

    Science.gov (United States)

    Qiu, X. Y.; Wang, R. X.; Zhang, Z.; Wei, M. L.; Ji, H.; Chai, Y.; Zhou, F. C.; Dai, J. Y.; Zhang, T.; Li, L. T.; Meng, X. S.

    2017-10-01

    A set of (001) epitaxial NiO films were prepared on highly textured (001) Pt seed layers using magnetron sputtering, and their resistive switching performance was measured. Cube-to-cube epitaxial relationships of NiO(001)//Pt(001) and NiO[001]//Pt[001] were demonstrated. Current-voltage measurements revealed that the Ag/(001)NiO/(001)Pt capacitor structures exhibited stable bipolar switching behavior with an ON/OFF ratio of 20 and an endurance of over 5 × 103 cycles. Furthermore, inserting a HfO2 buffer layer between the NiO film and the Ag top electrode increased the ON/OFF ratio to more than 103 and reduced the SET/RESET voltage to below ±0.2 V. These enhancements are attributed to the differing filament growth mechanisms that occur in the NiO and HfO2 layers. The present work suggests that Ag/HfO2/(001)NiO/(001)Pt capacitor structures are a promising technology for next-generation, ultra-low voltage resistive switching memory.

  11. EDITORIAL: Epitaxial graphene Epitaxial graphene

    Science.gov (United States)

    de Heer, Walt A.; Berger, Claire

    2012-04-01

    Graphene is widely regarded as an important new electronic material with interesting two-dimensional electron gas properties. Not only that, but graphene is widely considered to be an important new material for large-scale integrated electronic devices that may eventually even succeed silicon. In fact, there are countless publications that demonstrate the amazing applications potential of graphene. In order to realize graphene electronics, a platform is required that is compatible with large-scale electronics processing methods. It was clear from the outset that graphene grown epitaxially on silicon carbide substrates was exceptionally well suited as a platform for graphene-based electronics, not only because the graphene sheets are grown directly on electronics-grade silicon carbide (an important semiconductor in its own right), but also because these sheets are oriented with respect to the semiconductor. Moreover, the extremely high temperatures involved in production assure essentially defect-free and contamination-free materials with well-defined interfaces. Epitaxial graphene on silicon carbide is not a unique material, but actually a class of materials. It is a complex structure consisting of a reconstructed silicon carbide surface, which, for planar hexagonal silicon carbide, is either the silicon- or the carbon-terminated face, an interfacial carbon rich layer, followed by one or more graphene layers. Consequently, the structure of graphene films on silicon carbide turns out to be a rich surface-science puzzle that has been intensively studied and systematically unravelled with a wide variety of surface science probes. Moreover, the graphene films produced on the carbon-terminated face turn out to be rotationally stacked, resulting in unique and important structural and electronic properties. Finally, in contrast to essentially all other graphene production methods, epitaxial graphene can be grown on structured silicon carbide surfaces to produce graphene

  12. Electron tomography of (In,Ga)N insertions in GaN nanocolumns grown on semi-polar (112{sup -}2) GaN templates

    Energy Technology Data Exchange (ETDEWEB)

    Niehle, M., E-mail: niehle@pdi-berlin.de; Trampert, A., E-mail: trampert@pdi-berlin.de [Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin (Germany); Albert, S.; Bengoechea-Encabo, A.; Calleja, E. [ISOM and Departamento de Ingeniería Electrónica, ETSI Telecomunicación, Universidad Politécnica de Madrid, Ciudad Universitaria s/n, 28040 Madrid (Spain)

    2015-03-01

    We present results of scanning transmission electron tomography on GaN/(In,Ga)N/GaN nanocolumns (NCs) that grew uniformly inclined towards the patterned, semi-polar GaN(112{sup -}2) substrate surface by molecular beam epitaxy. For the practical realization of the tomographic experiment, the nanocolumn axis has been aligned parallel to the rotation axis of the electron microscope goniometer. The tomographic reconstruction allows for the determination of the three-dimensional indium distribution inside the nanocolumns. This distribution is strongly interrelated with the nanocolumn morphology and faceting. The (In,Ga)N layer thickness and the indium concentration differ between crystallographically equivalent and non-equivalent facets. The largest thickness and the highest indium concentration are found at the nanocolumn apex parallel to the basal planes.

  13. Improved growth rates and purity of basic ammonothermal GaN

    Science.gov (United States)

    Pimputkar, S.; Kawabata, S.; Speck, J. S.; Nakamura, S.

    2014-10-01

    Improvements to the experimental setup for the basic ammonothermal growth of GaN and the introduction of a silver capsule into the autoclave have yielded an ultrahigh purity (UHP) growth environment with reproducible external wall temperature profiles to within the error of the thermocouples (type K with special limits of error (SLE), ±2.5 °C). 40 basic ammonothermal growth runs were performed on hydride vapor phase epitaxy (HVPE) GaN seed crystals with different crystal orientations to optimize the growth system. Due to the UHP growth environment, transition metal impurities in the GaN crystals were reduced to less than 1×1017 cm-3 and oxygen impurity concentrations were comparable to those of the polycrystalline HVPE GaN source material (1×1019 cm-3). Total growth rates improved to 344±30 μm/day for c-plane growth and 46±2 μm/day for m-plane growth. The crystal quality, as measured by the full width at half maximum (FWHM) of the ω-rocking curve using X-ray diffraction (ω-XRC), was comparable to that of the seed crystal, except for Ga-face growth on c-plane oriented seeds due to poor nucleation and cracking in thick growth layers due to strain originating from the HVPE seed crystals. The difference in total system pressure profiles during growth runs using autoclaves with and without a silver capsule was analyzed and the pressure drop due to outward diffusion of hydrogen during growth was modeled.

  14. Deep levels in a-plane, high Mg-content Mg{sub x}Zn{sub 1-x}O epitaxial layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Guer, Emre [Department of Physics, Faculty of Science, Atatuerk University, Erzurum 25240 (Turkey); 205 Dreese Laboratory, Department of Electrical and Computer Engineering, The Ohio State University, 2015 Neil Avenue, Columbus, Ohio 43210-1272 (United States); Tabares, G.; Hierro, A. [Dpto. Ingenieria Electronica and ISOM, Universidad Politecnica de Madrid, Ciudad Universitaria s/n, 28040 Madrid (Spain); Arehart, A.; Ringel, S. A. [205 Dreese Laboratory, Department of Electrical and Computer Engineering, Ohio State University, 2015 Neil Avenue, Columbus, Ohio 43210-1272 (United States); Chauveau, J. M. [CRHEA-CNRS, 06560 Valbonne (France); University of Nice Sophia Antipolis, ParcValrose, 06102 Nice Cedex 2 (France)

    2012-12-15

    Deep level defects in n-type unintentionally doped a-plane Mg{sub x}Zn{sub 1-x}O, grown by molecular beam epitaxy on r-plane sapphire were fully characterized using deep level optical spectroscopy (DLOS) and related methods. Four compositions of Mg{sub x}Zn{sub 1-x}O were examined with x = 0.31, 0.44, 0.52, and 0.56 together with a control ZnO sample. DLOS measurements revealed the presence of five deep levels in each Mg-containing sample, having energy levels of E{sub c} - 1.4 eV, 2.1 eV, 2.6 V, and E{sub v} + 0.3 eV and 0.6 eV. For all Mg compositions, the activation energies of the first three states were constant with respect to the conduction band edge, whereas the latter two revealed constant activation energies with respect to the valence band edge. In contrast to the ternary materials, only three levels, at E{sub c} - 2.1 eV, E{sub v} + 0.3 eV, and 0.6 eV, were observed for the ZnO control sample in this systematically grown series of samples. Substantially higher concentrations of the deep levels at E{sub v} + 0.3 eV and E{sub c} - 2.1 eV were observed in ZnO compared to the Mg alloyed samples. Moreover, there is a general invariance of trap concentration of the E{sub v} + 0.3 eV and 0.6 eV levels on Mg content, while at least and order of magnitude dependency of the E{sub c} - 1.4 eV and E{sub c} - 2.6 eV levels in Mg alloyed samples.

  15. Epitaxial silicon carbide on a 6″ silicon wafer

    Science.gov (United States)

    Kukushkin, S. A.; Lukyanov, A. V.; Osipov, A. V.; Feoktistov, N. A.

    2014-01-01

    The results of the growth of silicon-carbide films on silicon wafers with a large diameter of 150 mm (6″) by using a new method of solid-phase epitaxy are presented. A SiC film growing on Si wafers was studied by means of spectral ellipsometry, SEM, X-ray diffraction, and Raman scattering. As follows from the studies, SiC layers are epitaxial over the entire surface of a 150-mm wafer. The wafers have no mechanical stresses, are smooth, and do not have bends. The half-width of the X-ray rocking curve (FWHMω- θ) of the wafers varies in the range from 0.7° to 0.8° across the thickness layer of 80-100 nm. The wafers are suitable as templates for the growth of SiC, AlN, GaN, ZnO, and other wide-gap semiconductors on its surface using standard CVD, HVPE, and MBE methods.

  16. GaN Initiative for Grid Applications (GIGA)

    Energy Technology Data Exchange (ETDEWEB)

    Turner, George [MIT Lincoln Lab., Lexington, MA (United States)

    2015-07-03

    For nearly 4 ½ years, MIT Lincoln Laboratory (MIT/LL) led a very successful, DoE-funded team effort to develop GaN-on-Si materials and devices, targeting high-voltage (>1 kV), high-power, cost-effective electronics for grid applications. This effort, called the GaN Initiative for Grid Applications (GIGA) program, was initially made up of MIT/LL, the MIT campus group of Prof. Tomas Palacios (MIT), and the industrial partner M/A Com Technology Solutions (MTS). Later in the program a 4th team member was added (IQE MA) to provide commercial-scale GaN-on-Si epitaxial materials. A basic premise of the GIGA program was that power electronics, for ubiquitous utilization -even for grid applications - should be closer in cost structure to more conventional Si-based power electronics. For a number of reasons, more established GaN-on-SiC or even SiC-based power electronics are not likely to reach theses cost structures, even in higher manufacturing volumes. An additional premise of the GIGA program was that the technical focus would be on materials and devices suitable for operating at voltages > 1 kV, even though there is also significant commercial interest in developing lower voltage (< 1 kV), cost effective GaN-on-Si devices for higher volume applications, like consumer products. Remarkable technical progress was made during the course of this program. Advances in materials included the growth of high-quality, crack-free epitaxial GaN layers on large-diameter Si substrates with thicknesses up to ~5 μm, overcoming significant challenges in lattice mismatch and thermal expansion differences between Si and GaN in the actual epitaxial growth process. Such thick epilayers are crucial for high voltage operation of lateral geometry devices such as Schottky barrier (SB) diodes and high electron mobility transistors (HEMTs). New “Normally-Off” device architectures were demonstrated – for safe operation of power electronics circuits. The trade-offs between lateral and

  17. Growth and characterisation of GaN

    CERN Document Server

    Li, T

    2002-01-01

    This thesis describes mainly the studies on growth mechanism of GaN in UHV-MOVPE process, and structural and optical properties of As-doped GaN films grown by PA-MBE. In a novel Thomas Swan growth chamber, we have grown GaN films on Si substrates using TEGa, plasma nitrogen and ammonia. Using a combination of in-situ optical reflectivity and mass spectrometry, we have investigated the parameters controlling the growth process of UHV-MOVPE. In particular we have used sup 1 sup 5 N in order to distinguish gas phase species containing N from those associated purely with metal-organics. We found the surface pyrolysis of TEGa is the rate limiting step, which is similar to GaAs grown by CBE. We also identify the parasitic reactions costing the active nitrogen from plasma, which in turn limits the growth rate. Using Philips X' pert MRD, we have investigated the structural properties of As-doped GaN epitaxial films on sapphire grown by PA-MBE including phase, lattice parameters and mosacity. We have also studied the ...

  18. Conductivity based on selective etch for GaN devices and applications thereof

    Science.gov (United States)

    Zhang, Yu; Sun, Qian; Han, Jung

    2015-12-08

    This invention relates to methods of generating NP gallium nitride (GaN) across large areas (>1 cm.sup.2) with controlled pore diameters, pore density, and porosity. Also disclosed are methods of generating novel optoelectronic devices based on porous GaN. Additionally a layer transfer scheme to separate and create free-standing crystalline GaN thin layers is disclosed that enables a new device manufacturing paradigm involving substrate recycling. Other disclosed embodiments of this invention relate to fabrication of GaN based nanocrystals and the use of NP GaN electrodes for electrolysis, water splitting, or photosynthetic process applications.

  19. Effect of Si doping on the growth and microstructure of GaN grown on Si(1 1 1) using SiC as a buffer layer

    Science.gov (United States)

    Wang, D.; Yoshida, S.; Ichikawa, M.

    2002-07-01

    We studied the initial growth of Si-doped GaN (GaN:Si) epilayers grown under both N- and Ga-rich conditions. Upon Si doping, the surface polarity changed from N- to Ga-polarity. The surface diffusion kinetics of the Ga adatoms of the GaN:Si epilayers depended strongly on the Ga/N flux ratio. GaN:Si films with good crystal quality were obtained for a Ga/N flux ratio slightly larger than 1. The dislocation density decreased about one order of magnitude, while the stacking fault and cubic phase density near the interfacial region increased. The main types of dislocations in the undoped GaN were mixed and edge dislocations. In the GaN:Si, the main dislocations were pure-edge dislocations. The dislocation-density reduction in the GaN:Si may have been due to a low density of mixed dislocations in the presence of a high density of stacking faults and cubic phase.

  20. p- and n-type cubic GaN epilayers on GaAs

    Science.gov (United States)

    As, D. J.; Schikora, D.; Greiner, A.; Lübbers, M.; Mimkes, J.; Lischka, K.

    1996-10-01

    Temperature-dependent Hall-effect measurements are performed on cubic GaN layers grown by plasma-assisted molecular-beam epitaxy on (100) GaAs substrates. We find that under N-rich conditions, cubic GaN films are p-type with hole concentrations of ~=1013 cm-3 and mobilities of about 350 cm2/V s at room temperature. The acceptors have an activation energy of EA=0.445+/-0.015 eV. Ga-rich growth conditions result in n-type conductivity with electron concentrations of about 1014 cm-3 and room-temperature mobilities of μn~=100cm2/V s. Since for n-type samples a strong influence of the underlaying semi-insulating GaAs substrate is observed, a two-layer model is used to evaluate the Hall data, yielding a shallow donor with an activation energy of ED=0.16+/-0.07 eV and a deeper donor with EDD=0.60+/-0.10 eV.

  1. Photoreflectance study of GaN grown on SiN treated sapphire substrate by MOVPE

    Science.gov (United States)

    Bouzidi, M.; Benzarti, Z.; Halidou, I.; Chine, Z.; Bchetnia, A.; El Jani, B.

    2015-08-01

    GaN films were grown on silicon nitride (SiN) treated c-plane sapphire substrates in a home-made vertical reactor by atmospheric pressure metalorganic vapor phase epitaxy (MOVPE). In order to obtain different thickness layers, the growth procedure was interrupted at diverse stages using in-situ laser reflectometry. The structural and optical properties of obtained samples were investigated by high resolution X-ray diffraction (HRXRD) and photoreflectance (PR). In the 0.7-2 μm epilayer thickness range, the dislocation density decreases and remains roughly constant above this range. For fully coalesced layers, PR measurements at 11 K reveal the presence of well resolved excitonic transitions related to A, B and C excitons. A strong correlation between dislocation density and exciton linewidths is observed. Based on theoretical approaches and experimental results, the electronic band structure modification of GaN films due to isotropic biaxial strain was investigated. The valence band deformation potentials D3 and D4, interband hydrostatic deformation potentials a1 and a2, spin-orbit Δso and crystal field Δcr parameters were re-examined and found to be 8.2 eV, -4.1 eV, -3.8 eV, -12 eV, 15.6 meV and 16.5 meV, respectively.

  2. Surface segregation as a means of gettering Cu in liquid-phase-epitaxy silicon thin layers grown from Al-Cu-Si solutions

    Energy Technology Data Exchange (ETDEWEB)

    Wang, T.H.; Ciszek, T.F.; Reedy, R.; Asher, S.; King, D. [National Renewable Energy Lab., Golden, CO (United States)

    1996-05-01

    The authors demonstrate that, by using the natural surface segregation phenomenon, Cu can be gettered to the surface from the bulk of silicon layers so that its concentrations in the liquid-phase-epitaxy (LPE) layers are much lower than its solubility at the layer growth temperature and the reported 10{sup 17} cm{sup {minus}3} degradation threshold for solar-cell performance. Secondary-ion mass spectroscopy (SIMS) analysis indicates that, within a micron-deep sub-surface region, Cu accumulates even in as-grown LPE samples. Slower cooling after growth to room temperature enhances this Cu enrichment. X-ray photoelectron spectroscopy (XPS) measurement shows as much as 3.2% Cu in a surface region of about 50 {Angstrom}. More surface-sensitive, ion-scattering spectroscopy (ISS) analysis further reveals about 7% of Cu at the top surface. These results translate to an areal gettering capacity of about 1.0 x 10{sup 16} cm{sup {minus}2}, which is higher than the available total-area density of Cu in the layer and substrate (3.6 x 10{sup 15} cm{sup {minus}2} for a uniform 1.2 x 10{sup 17}cm{sup {minus}3} Cu throughout the layer and substrate with a total thickness of 300 {mu}m).

  3. Surface segregation as a means of gettering Cu in liquid-phase-epitaxy silicon thin layers grown from Al-Cu-Si solutions

    Energy Technology Data Exchange (ETDEWEB)

    Wang, T.H.; Ciszek, T.F.; Reedy, R.; Asher, S.; King, D. [National Renewable Energy Lab., Golden, CO (United States)

    1996-09-01

    The authors demonstrate that, by using the natural surface segregation phenomenon, Cu can be gettered to the surface from the bulk of silicon layers so that its concentrations in the liquid-phase-epitaxy (LPE) layers are much lower than its solubility at the layer growth temperature and the reported 10{sup 17} cm{sup {minus}3} degradation threshold for solar-cell performance. Secondary-ion mass spectroscopy (SIMS) analysis indicates that, within a micron-deep sub-surface region, Cu accumulates even in as-grown LPE samples. Slower cooling after growth to room temperature enhances this Cu enrichment. X-ray photoelectron spectroscopy (XPS) measurement shows as much as 3.2% Cu in a surface region of about 50 {angstrom}. More surface-sensitive, ion-scattering spectroscopy (ISS) analysis further reveals about 7% of Cu at the top surface. These results translate to an areal gettering capacity of about 1.0 {times} 10{sup 16} cm{sup {minus}2}, which is higher than the available total-area density of Cu in the layer and substrate (3.6 {times} 10{sup 15} cm{sup {minus}2} for a uniform 1.2 {times} 10{sup 17} cm{sup {minus}3} Cu throughout the layer and substrate with a total thickness of 300 {micro}m).

  4. Epitaxial thin films

    Science.gov (United States)

    Hunt, Andrew Tye; Deshpande, Girish; Lin, Wen-Yi; Jan, Tzyy-Jiuan

    2006-04-25

    Epitatial thin films for use as buffer layers for high temperature superconductors, electrolytes in solid oxide fuel cells (SOFC), gas separation membranes or dielectric material in electronic devices, are disclosed. By using CCVD, CACVD or any other suitable deposition process, epitaxial films having pore-free, ideal grain boundaries, and dense structure can be formed. Several different types of materials are disclosed for use as buffer layers in high temperature superconductors. In addition, the use of epitaxial thin films for electrolytes and electrode formation in SOFCs results in densification for pore-free and ideal gain boundary/interface microstructure. Gas separation membranes for the production of oxygen and hydrogen are also disclosed. These semipermeable membranes are formed by high-quality, dense, gas-tight, pinhole free sub-micro scale layers of mixed-conducting oxides on porous ceramic substrates. Epitaxial thin films as dielectric material in capacitors are also taught herein. Capacitors are utilized according to their capacitance values which are dependent on their physical structure and dielectric permittivity. The epitaxial thin films of the current invention form low-loss dielectric layers with extremely high permittivity. This high permittivity allows for the formation of capacitors that can have their capacitance adjusted by applying a DC bias between their electrodes.

  5. Demonstration of a visible laser on silicon using Eu-doped GaN thin films

    Science.gov (United States)

    Park, J. H.; Steckl, A. J.

    2005-09-01

    We report the demonstration of visible laser action on silicon. We have utilized Eu-doped GaN for the active medium within a structure consisting of multiple AlGaN layers grown by molecular-beam epitaxy on a Si substrate. Stimulated emission was obtained at room temperature from Eu3+ at 620 nm, with a threshold of ~117 kW/cm2. Values of modal gain and loss of ~100 and 46 cm-1 were measured. This demonstration indicates that utilizing rare earths a range of lasers on Si can be obtained, covering the UV, visible, and IR regions, thus enabling a significant expansion of optoelectronic and microelectronic integrations.

  6. Ferromagnetism in undoped One-dimensional GaN Nanowires

    Directory of Open Access Journals (Sweden)

    K. Jeganathan

    2014-05-01

    Full Text Available We report an intrinsic ferromagnetism in vertical aligned GaN nanowires (NW fabricated by molecular beam epitaxy without any external catalyst. The magnetization saturates at ∼0.75 × emu/gm with the applied field of 3000 Oe for the NWs grown under the low-Gallium flux of 2.4 × 10−8 mbar. Despite a drop in saturation magnetization, narrow hysteresis loop remains intact regardless of Gallium flux. Magnetization in vertical standing GaN NWs is consistent with the spectral analysis of low-temperature photoluminescence pertaining to Ga-vacancies associated structural defects at the nanoscale.

  7. Ivestigation of an InGaN - GaN nanowire heterstructure

    Energy Technology Data Exchange (ETDEWEB)

    Limbach, Friederich; Gotschke, Tobias; Stoica, Toma; Calarco, Raffaella; Gruetzmacher, Detlev [Institute of Bio- and Nanosystems (IBN-1), Research Center Juelich GmbH, Juelich (Germany); JARA-Fundamentals of Future Information Technology, Juelich (Germany); Sutter, Eli; Ciston, Jim [Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY (United States); Cusco, Ramon; Artus, Luis [Institut Jaume Almera, Consell Superior d' Investigacions Cientifiques (CSIC), Barcelona, Catalonia (Spain); Kremling, Stefan; Hoefling, Sven; Worschech, Lukas [University Wurzburg, Wilhelm Conrad Rontgen Research Centre Complex Matter Systems, Wuerzburg (Germany)

    2011-07-01

    InGaN/GaN nanowire (NW) heterostructures grown by molecular beam epitaxy were studied in comparison to their GaN and InGaN counterparts. The InGaN/GaN heterostructure NWs are composed of a GaN NW, a thin InGaN shell, and a multi-faceted InGaN cap wrapping the top part of the GaN NW. Transmission electron microscopy images taken from different parts of a InGaN/GaN nanowire show a wurtzite structure of the GaN core and the epitaxial InGaN shell around it. Photoluminescence spectra of these heterostructure NW ensembles show an emission peak at 2.1 eV. However, {mu}-PL spectra measured on single nanowires reveal much sharper luminescence peaks. A Raman analysis reveals a variation of the In content between 20 % and 30 %, in agreement with PL and TEM investigations.

  8. Taevo Gans / Ene Ammer

    Index Scriptorium Estoniae

    Ammer, Ene

    1998-01-01

    Sisearhitekt Taevo Gansist. Tudengipõlvest, selle aja projektidest, sõpruskonnast, tandemist Summatavet & Gans, Venemaa tellimustest, kaastöölistest. Üksinda Hommilkumaal vene tarbekunsti näitusega 1974. a. 1988. a. loodud perefirmast "GaDis" (omanikud Taevo, Helle Gans, Riia Oja), mis nõustab ka "Wermot" mööbli osas. "GaDise" sisekujundusprojektidest, millega Taevo ja Helle Gans tegelevad üheskoos

  9. Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering

    Energy Technology Data Exchange (ETDEWEB)

    Anderson, Virginia R.; Nepal, Neeraj; Johnson, Scooter D.; Robinson, Zachary R.; Nath, Anindya; Kozen, Alexander C.; Qadri, Syed B.; DeMasi, Alexander; Hite, Jennifer K.; Ludwig, Karl F.; Eddy, Charles R.

    2017-05-01

    Wide bandgap semiconducting nitrides have found wide-spread application as light emitting and laser diodes and are under investigation for further application in optoelectronics, photovoltaics, and efficient power switching technologies. Alloys of the binary semiconductors allow adjustments of the band gap, an important semiconductor material characteristic, which is 6.2 eV for aluminum nitride (AlN), 3.4 eV for gallium nitride, and 0.7 eV for (InN). Currently, the highest quality III-nitride films are deposited by metalorganic chemical vapor deposition and molecular beam epitaxy. Temperatures of 900 °C and higher are required to deposit high quality AlN. Research into depositing III-nitrides with atomic layer epitaxy (ALEp) is ongoing because it is a fabrication friendly technique allowing lower growth temperatures. Because it is a relatively new technique, there is insufficient understanding of the ALEp growth mechanism which will be essential to development of the process. Here, grazing incidence small angle x-ray scattering is employed to observe the evolving behavior of the surface morphology during growth of AlN by ALEp at temperatures from 360 to 480 °C. Increased temperatures of AlN resulted in lower impurities and relatively fewer features with short range correlations.

  10. Growth and charge ordering of epitaxial YbFe2O4 films on sapphire using Fe3O4 buffer layer

    Science.gov (United States)

    Fujii, Tatsuo; Numata, Tomoya; Nakahata, Hiroki; Nakanishi, Makoto; Kano, Jun; Ikeda, Naoshi

    2018-01-01

    Well-crystallized epitaxial YbFe2O4 films were prepared on an α-Al2O3(001) substrate using an Fe3O4 buffer layer. Fe3O4 has a relatively small lattice mismatch with both YbFe2O4 and α-Al2O3. Electron diffraction analysis combined with transmission electron microscopy revealed the epitaxial relationship to be α-Al2O3[110](001) ∥ Fe3O4[\\bar{2}11](111) ∥ YbFe2O4[110](001). Moreover, superlattice spots due the Fe2+–Fe3+ charge order state of YbFe2O4 were clarified. The Fe2+/Fe3+ ratio in YbFe2O4 was nearly stoichiometric. The film exhibited a ferrimagnetic transition at ∼220 K and a nonlinear current–voltage characteristic at room temperature. These results confirmed the good crystallinity and stoichiometry of the obtained YbFe2O4 films.

  11. Studies of deep level centers determining the diffusion length in epitaxial layers and crystals of undoped n-GaN

    Energy Technology Data Exchange (ETDEWEB)

    Lee, In-Hwan [School of Advanced Materials Engineering and Research Center of Advanced Materials Development, Chonbuk National University, Jeonju 561-756 (Korea, Republic of); Polyakov, A. Y.; Turutin, A. V.; Shemerov, I. V. [National University of Science and Technology MISiS, Leninskiy pr. 4, Moscow 119049 (Russian Federation); Smirnov, N. B. [National University of Science and Technology MISiS, Leninskiy pr. 4, Moscow 119049 (Russian Federation); Institute of Rare Metals, B. Tolmachevsky, 5, Moscow 119017 (Russian Federation); Yakimov, E. B. [National University of Science and Technology MISiS, Leninskiy pr. 4, Moscow 119049 (Russian Federation); Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Science, 6, Academician Ossipyan str., Chernogolovka, Moscow Region 142432 (Russian Federation); Tarelkin, S. A. [National University of Science and Technology MISiS, Leninskiy pr. 4, Moscow 119049 (Russian Federation); Technological Institute for Superhard and Novel Carbon Materials, 7 Centralnaya St., Troitsk, Moscow 142190 (Russian Federation); Pearton, S. J., E-mail: spear@mse.ufl.edu [University of Florida, Gainesville, Florida 32611 (United States)

    2016-05-28

    A wide variety of parameters were measured for undoped n-GaN grown by hydride vapor phase epitaxy and compared to n-GaN films grown by conventional and lateral overgrowth metalorganic chemical vapor deposition. The parameters included deep level electron and hole trap spectra, microcathodoluminescence, electron beam induced current, diffusion length, and electron capture cross section from the dependence of the low temperature persistent photocapacitance on forward bias injection pulse duration. The results show a prominent role of electron traps with levels near E{sub c}-0.56 eV in limiting the lifetime and diffusion length values in all these materials.

  12. Optical homogeneity analysis of Hg1-xCdxTe epitaxial layers: How to circumvent the influence of impurity absorption bands?

    Science.gov (United States)

    Wang, Han; Hong, Jin; Yue, Fangyu; Jing, Chengbin; Chu, Junhao

    2017-05-01

    Optical absorption and photoluminescence spectroscopies are standard tools for analysis of HgHg1-xCdxTe epitaxial layers in terms of homogeneity of the mole-fraction (x). For technological relevant layer thicknesses of ∼10 μm, both techniques may show dissimilar results, in particular if doped layers are investigated. This is due to defect levels, which impact to the results obtained by both techniques in different ways. We systematically investigate this behavior by analyzing two sets of HgCdTe layers, one set intrinsically doped by Hg-vacancies, the other extrinsically doped by arsenic (As). A model is outlined and applied to the experimental results, which consistently explains even non-monotonous temperature-shifts of the spectra. Eventually, guidelines for optical homogeneity tests are given. While transmission measurements are most reliable, when carried out at low temperature, where the defect level are frozen out, photoluminescence provides best results at ambient temperature, where band-states are increasingly populated. Both approaches help to reveal intrinsic material properties.

  13. High nitrogen pressure solution growth of GaN

    Science.gov (United States)

    Bockowski, Michal

    2014-10-01

    Results of GaN growth from gallium solution under high nitrogen pressure are presented. Basic of the high nitrogen pressure solution (HNPS) growth method is described. A new approach of seeded growth, multi-feed seed (MFS) configuration, is demonstrated. The use of two kinds of seeds: free-standing hydride vapor phase epitaxy GaN (HVPE-GaN) obtained from metal organic chemical vapor deposition (MOCVD)-GaN/sapphire templates and free-standing HVPE-GaN obtained from the ammonothermally grown GaN crystals, is shown. Depending on the seeds’ structural quality, the differences in the structural properties of pressure grown material are demonstrated and analyzed. The role and influence of impurities, like oxygen and magnesium, on GaN crystals grown from gallium solution in the MFS configuration is presented. The properties of differently doped GaN crystals are discussed. An application of the pressure grown GaN crystals as substrates for electronic and optoelectronic devices is reported.

  14. Absorption edge of variable-gap epitaxial layers of InAs(1-x)Sb(x) (x less than or = 0. 54)

    Energy Technology Data Exchange (ETDEWEB)

    Zotova, N.V.; Losev, A.V.; Matveev, B.A.; Stus' , N.M.; Talalakin, G.N. (Fiziko-Tekhnicheskii Institut, Leningrad (USSR))

    1990-02-01

    Results of an experimental study aimed at the preparation and study of narrow-gap solid solutions InAs(1-x)Sb(x) (x less than or = 0.54) are reported. Test specimens were prepared by melt crystallization on (111) InAs substrates under forced cooling starting from 680-720 C. It is found that the growth of InAs/InAsSbP/InAs(1-x)Sb(x) gradient structures by liquid phase epitaxy under conditions of high substrate plasticity makes it possible to produce layers with Eg of 90 meV or greater whose absorption edge has the form typical of variable-gap semiconductors. 8 refs.

  15. Study of the conduction-type conversion in Si-doped (631)A GaAs layers grown by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Cruz-Hernandez, E.; Vazquez-Cortes, D.; Mendez-Garcia, V.H. [Coordinacion para la Innovacion y Aplicacion de la Ciencia y Tecnologia, Universidad Autonoma de San Luis Potosi, Av. Sierra Leona 550, Col. Lomas 2a. Seccion, San Luis Potosi, S.L.P. 78210 (Mexico); Shimomura, S. [Graduate School of Science and Engineering, Ehime University, 3 Bukyo-cho, Matsuyama, Ehime 790-8577 (Japan); Lopez-Lopez, M. [Physics Department, Centro de Investigacion y de Estudios Avanzados del IPN, Apartado Postal 14-740, Mexico DF 07000 (Mexico)

    2011-02-15

    We report the Si-doping of GaAs (631)A layers grown by molecular beam epitaxy under different As overpressure. From Hall effect measurements, we have found that the increase of the As pressure induces conduction conversion from p- to n-type, which is presumably related to lattice site switching of Si occupying an As site (where Si is acceptor) to a Ga site (where Si acts as a donor). This conversion is also studied by photoluminescence (PL) spectroscopy. The sharp conductivity conversion, at a critical As pressure value of 1.4-1.7 x 10{sup -5} mbar is reflected in the optical properties of the samples by a change of As vacancy defects into pairs of Ga vacancy and Ga antisite defects. (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  16. Methods for improved growth of group III nitride buffer layers

    Science.gov (United States)

    Melnik, Yurity; Chen, Lu; Kojiri, Hidehiro

    2014-07-15

    Methods are disclosed for growing high crystal quality group III-nitride epitaxial layers with advanced multiple buffer layer techniques. In an embodiment, a method includes forming group III-nitride buffer layers that contain aluminum on suitable substrate in a processing chamber of a hydride vapor phase epitaxy processing system. A hydrogen halide or halogen gas is flowing into the growth zone during deposition of buffer layers to suppress homogeneous particle formation. Some combinations of low temperature buffers that contain aluminum (e.g., AlN, AlGaN) and high temperature buffers that contain aluminum (e.g., AlN, AlGaN) may be used to improve crystal quality and morphology of subsequently grown group III-nitride epitaxial layers. The buffer may be deposited on the substrate, or on the surface of another buffer. The additional buffer layers may be added as interlayers in group III-nitride layers (e.g., GaN, AlGaN, AlN).

  17. InGaN/GaN nanowires epitaxy on large-area MoS2 for high-performance light-emitters

    KAUST Repository

    Zhao, Chao

    2017-05-18

    The recent study of a wide range of layered transition metal dichalcogenides (TMDCs) has created a new era for device design and applications. In particular, the concept of van der Waals epitaxy (vdWE) utilizing layered TMDCs has the potential to broaden the family of epitaxial growth techniques beyond the conventional methods. We report herein, for the first time, the monolithic high-power, droop-free, and wavelength tunable InGaN/GaN nanowire light-emitting diodes (NW-LEDs) on large-area MoS2 layers formed by sulfurizing entire Mo substrates. MoS2 serves as both a buffer layer for high-quality GaN nanowires growth and a sacrificial layer for epitaxy lift-off. The LEDs obtained on nitridated MoS2 via quasi vdWE show a low turn-on voltage of ∼2 V and light output power up to 1.5 mW emitting beyond the “green gap”, without an efficiency droop up to the current injection of 1 A (400 A cm−2), by virtue of high thermal and electrical conductivities of the metal substrates. The discovery of the nitride/layered TMDCs/metal heterostructure platform also ushers in the unparalleled opportunities of simultaneous high-quality nitrides growth for high-performance devices, ultralow-profile optoelectronics, energy harvesting, as well as substrate reusability for practical applications.

  18. Pendeo-epitaxial growth and characterization of thin films of gallium nitride and related materials on SiC(0001) and Si(111) substrates

    Energy Technology Data Exchange (ETDEWEB)

    Davis, R.F.; Zheleva, T.S. [North Carolina State Univ., Raleigh, NC (United States); Gehrke, T. [North Carolina State Univ., Raleigh, NC (United States); Nitronex Corp., Raleigh, NC (United States); Linthicum, K.J.; Rajagopal, P. [Nitronex Corp., Raleigh, NC (United States); Zorman, C.A.; Mehregany, M. [Case Western Reserve Univ., Cleveland, OH (United States)

    2001-02-01

    Monocrystalline GaN and Al{sub x}Ga{sub 1-x}N films have been grown via the pendeo-epitaxy (PE) technique with and without Si{sub 3}N{sub 4} masks on GaN/AlN/6H-SiC(0001) and GaN(0001)/AlN(0001)/3C-SiC(111)/Si(111) substrates using organometallic vapor phase deposition. Scanning and transmission electron microscopies were used to evaluate the external microstructures and the distribution of dislocations, respectively. The dislocation densities in the PE grown films were reduced at least five orders of magnitude relative to the initial GaN seed layers. Tilting to 0.2 in the portion of the coalesced GaN epilayers grown over the silicon nitride masks was observed via X-ray diffraction. Neither tilting nor low angle boundaries were observed within areas of coalescence in the material grown on substrates without the masks. (orig.)

  19. Interfacial Structure and Chemistry of GaN on Ge(111)

    Science.gov (United States)

    Zhang, Siyuan; Zhang, Yucheng; Cui, Ying; Freysoldt, Christoph; Neugebauer, Jörg; Lieten, Ruben R.; Barnard, Jonathan S.; Humphreys, Colin J.

    2013-12-01

    The interface of GaN grown on Ge(111) by plasma-assisted molecular beam epitaxy is resolved by aberration corrected scanning transmission electron microscopy. A novel interfacial structure with a 5∶4 closely spaced atomic bilayer is observed that explains why the interface is flat, crystalline, and free of GeNx. Density functional theory based total energy calculations show that the interface bilayer contains Ge and Ga atoms, with no N atoms. The 5∶4 bilayer at the interface has a lower energy than a direct stacking of GaN on Ge(111) and enables the 5∶4 lattice-matching growth of GaN.

  20. Dislocation-induced nanoparticle decoration on a GaN nanowire.

    Science.gov (United States)

    Yang, Bing; Yuan, Fang; Liu, Qingyun; Huang, Nan; Qiu, Jianhang; Staedler, Thorsten; Liu, Baodan; Jiang, Xin

    2015-02-04

    GaN nanowires with homoepitaxial decorated GaN nanoparticles on their surface along the radial direction have been synthesized by means of a chemical vapor deposition method. The growth of GaN nanowires is catalyzed by Au particles via the vapor-liquid-solid (VLS) mechanism. Screw dislocations are generated along the radial direction of the nanowires under slight Zn doping. In contrast to the metal-catalyst-assisted VLS growth, GaN nanoparticles are found to prefer to nucleate and grow at these dislocation sites. High-resolution transmission electron microscopy (HRTEM) analysis demonstrates that the GaN nanoparticles possess two types of epitaxial orientation with respect to the corresponding GaN nanowire: (I) [1̅21̅0]np//[1̅21̅0]nw, (0001)np//(0001)nw; (II) [1̅21̅3]np//[12̅10]nw, (101̅0)np//(101̅0)nw. An increased Ga signal in the energy-dispersive spectroscopy (EDS) profile lines of the nanowires suggests GaN nanoparticle growth at the edge surface of the wires. All the crystallographic results confirm the importance of the dislocations with respect to the homoepitaxial growth of the GaN nanoparticles. Here, screw dislocations situated on the (0001) plane provide the self-step source to enable nucleation of the GaN nanoparticles.

  1. Effect of Zn and Te beam intensity upon the film quality of ZnTe layers on severely lattice mismatched sapphire substrates by molecular beam epitaxy

    Science.gov (United States)

    Nakasu, Taizo; Sun, W.; Kobayashi, M.; Asahi, T.

    2017-06-01

    Zinc telluride layers were grown on highly-lattice-mismatched sapphire substrates by molecular beam epitaxy, and their crystallographic properties were studied by means of X-ray diffraction pole figures. The crystal quality of the ZnTe thin film was further studied by scanning electron microscopy, X-ray rocking curves and low-temperature photoluminescence measurements. These methods show that high-crystallinity (111)-oriented single domain ZnTe layers with the flat surface and good optical properties are realized when the beam intensity ratio of Zn and Te beams is adjusted. The migration of Zn and Te was inhibited by excess surface material and cracks were appeared. In particular, excess Te inhibited the formation of a high-crystallinity ZnTe film. The optical properties of the ZnTe layer revealed that the exciton-related features were dominant, and therefore the film quality was reasonably high even though the lattice constants and the crystal structures were severely mismatched.

  2. Strain Engineering of Ferroelectric Domains in KxNa1−xNbO3 Epitaxial Layers

    Directory of Open Access Journals (Sweden)

    Jutta Schwarzkopf

    2017-08-01

    Full Text Available The application of lattice strain through epitaxial growth of oxide films on lattice mismatched perovskite-like substrates strongly influences the structural properties of ferroelectric domains and their corresponding piezoelectric behavior. The formation of different ferroelectric phases can be understood by a strain-phase diagram, which is calculated within the framework of the Landau–Ginzburg–Devonshire theory. In this paper, we illustrate the opportunity of ferroelectric domain engineering in the KxNa1−xNbO3 lead-free material system. In particular, the following examples are discussed in detail: (i Different substrates (NdGaO3, SrTiO3, DyScO3, TbScO3, and GdScO3 are used to systematically tune the incorporated epitaxial strain from compressive to tensile. This can be exploited to adjust the NaNbO3 thin film surface orientation and, concomitantly, the vector of electrical polarization, which rotates from mainly vertical to exclusive in-plane orientation. (ii In ferroelectric NaNbO3, thin films grown on rare-earth scandate substrates, highly regular stripe domain patterns are observed. By using different film thicknesses, these can be tailored with regard to domain periodicity and vertical polarization component. (iii A featured potassium concentration of x = 0.9 of KxNa1−xNbO3 thin films grown on (110 NdScO3 substrates favors the coexistence of two equivalent, monoclinic, but differently oriented ferroelectric phases. A complicated herringbone domain pattern is experimentally observed which consists of alternating MC and a1a2 domains. The coexistence of different types of ferroelectric domains leads to polarization discontinuities at the domain walls, potentially enabling high piezoelectric responses. In each of these examples, the experimental results are in excellent agreement with predictions based on the linear elasticity theory.

  3. Molecular orbital calculations for the formation of GaN layers on ultra-thin AlN/6H-SiC surface using alternating pulsative supply of gaseous trimethyl gallium (TMG) and NH sub 3

    CERN Document Server

    Seong, S Y

    2001-01-01

    The steps for the generation of very thin GaN films on ultrathin AlN/6H-SiC surface by alternating a pulsative supply (APS) of trimethyl gallium and NH sub 3 gases have been examined by ASED-MO calculations. We postulate that the gallium clusters was formed with the evaporation of CH sub 4 gases via the decomposition of trimethyl gallium (TMG), dimethyl gallium (DMG), and monomethyl gallium (MMG). During the injection of NH sub 3 gas into the reactor, the atomic hydrogens were produced from the thermal decomposition of NH sub 3 molecule. These hydrogen gases activated the Ga-C bond cleavage. An energetically stable GaN nucleation site was formed via nitrogen incorporation into the layer of gallium cluster. The nitrogen atoms produced from the thermal degradation of NH sub 3 were expected to incorporate into the edge of the gallium cluster since the galliums bind weakly to each other (0.19 eV). The structure was stabilized by 2.08 eV, as an adsorbed N atom incorporated into a tetrahedral site of the Ga cluster...

  4. Zinc-blende MnN bilayer formation on the GaN(111) surface

    Science.gov (United States)

    Gutierrez-Ojeda, S. J.; Guerrero-Sánchez, J.; Garcia-Diaz, R.; Ramirez-Torres, A.; Takeuchi, Noboru; Cocoletzi, Gregorio H.

    2017-07-01

    Atomic layers of manganese nitride, deposited on the cubic gallium nitride (111) surface, are investigated using spin polarized periodic density functional theory calculations. The adsorption of a manganese atom has been evaluated at different high symmetry sites. Incorporation into the GaN substrate by replacing gallium atoms drives the formation of a site in which the displaced Ga atom forms bonds with Ga atoms at the surface. This energetically favorable configuration shows a ferromagnetic alignment. Surface formation energy calculations demonstrate that when a full Mn ML is incorporated into the GaN structure, a Ga ML on top of a MnN bilayer may be formed for very Ga-rich conditions. On the other hand, when a full Mn ML is deposited on top of the nitrogen terminated surface, an epitaxial MnN bilayer is formed with antiferromagnetic characteristics. Density of states and partial density of states are reported to show the antiferromagnetic alignment in both structures. This behavior is mainly induced by the Mn-d orbitals.

  5. Curvature and bow of bulk GaN substrates

    Energy Technology Data Exchange (ETDEWEB)

    Foronda, Humberto M.; Young, Erin C.; Robertson, Christian A.; Speck, James S. [Materials Department, UCSB, Santa Barbara, California 93106 (United States); Romanov, Alexey E. [Materials Department, UCSB, Santa Barbara, California 93106 (United States); Ioffe Physico-Technical Institute RAS, St. Petersburg 194021 (Russian Federation); ITMO University, St. Petersburg 197101 (Russian Federation); Beltz, Glenn E. [Mechanical Engineering Department, UCSB, Santa Barbara, California 93106 (United States)

    2016-07-21

    We investigate the bow of free standing (0001) oriented hydride vapor phase epitaxy grown GaN substrates and demonstrate that their curvature is consistent with a compressive to tensile stress gradient (bottom to top) present in the substrates. The origin of the stress gradient and the curvature is attributed to the correlated inclination of edge threading dislocation (TD) lines away from the [0001] direction. A model is proposed and a relation is derived for bulk GaN substrate curvature dependence on the inclination angle and the density of TDs. The model is used to analyze the curvature for commercially available GaN substrates as determined by high resolution x-ray diffraction. The results show a close correlation between the experimentally determined parameters and those predicted from theoretical model.

  6. Transmission Electron Microscopy Study of Nonpolar a-Plane GaNGrown by Pendeo-Epitaxy on (112_0) 4H-SiC

    Energy Technology Data Exchange (ETDEWEB)

    Zakharov, D.N.; Liliental-Weber, Z.; Wagner, B.; Reitmeier, Z.J.; Preble, E.A.; Davis, R.F.

    2005-03-10

    Pendeo-epitaxy has been applied to nonpolar a-plane GaN layers in order to observe if such process will lead to defect reduction in comparison with direct growth on this plane. Uncoalesced and coalesced a-plane GaN layers with thicknesses 2{micro}m and 12{micro}m, respectively have been studied by conventional and high resolution electron microscopy. The following structural defects have been observed in pendeo-epitaxial layers: (1) basal stacking faults, (2) threading dislocations and (3) prismatic stacking faults. Drastic decrease of threading dislocation density and stacking faults have been observed in 'wing' areas with respect to 'seed' areas. Cross-section images reveal cracks and voids at the areas where two coalesced wings meet each other. High resolution electron microscopy shows that the majority of stacking faults are low-energy planar defects of the types I{sub 1}, I{sub 2} and I{sub 3}. The I{sub 3} type basal stacking fault, predicted theoretically, has been observed experimentally for the first time.

  7. Enhanced emission efficiency of GaN /InGaN multiple quantum well light-emitting diode with an embedded photonic crystal

    Science.gov (United States)

    Kwon, Min-Ki; Kim, Ja-Yeon; Park, Il-Kyu; Kim, Ki Seok; Jung, Gun-Young; Park, Seong-Ju; Kim, Je Won; Kim, Yong Chun

    2008-06-01

    A photonic crystal (PC) structure of periodic SiO2 pillar cubic array is embedded in n-GaN layer of InGaN /GaN multiple quantum well (MQW) blue (480nm) light-emitting diode (LED). The diameter, period, and depth of SiO2 pillar are 124±6, 230±10, and 130±10nm, respectively. The increments of 70% for external quantum efficiency, 17% for internal quantum efficiency, and 45% for light extraction efficiency from photoluminescence measurement, and 33% for optical output power at 20mA are observed for LEDs with an embedded PC layer. This improvement can be attributed to the increased extraction efficiency by PC effect as well as increased internal quantum efficiency due to the decrease of dislocation density in n-GaN layer because of an epitaxial lateral over-growth process.

  8. Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods

    Energy Technology Data Exchange (ETDEWEB)

    Nepal, Neeraj [U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375; Anderson, Virginia R. [American Society for Engineering Education, 1818 N Street NW, Washington, DC 20036; Johnson, Scooter D. [U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375; Downey, Brian P. [U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375; Meyer, David J. [U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375; DeMasi, Alexander [Physics Department, Boston University, 590 Commonwealth Avenue, Boston, Massachusetts 02215; Robinson, Zachary R. [Department of Physics, SUNY College at Brockport, 350 New Campus Dr, Brockport, New York 14420; Ludwig, Karl F. [Physics Department, Boston University, 590 Commonwealth Avenue, Boston, Massachusetts 02215; Eddy, Charles R. [U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375

    2017-03-13

    The temporal evolution of high quality indium nitride (InN) growth by plasma-assisted atomic layer epitaxy (ALEp) on a-plane sapphire at 200 and 248 °C was probed by synchrotron x-ray methods. The growth was carried out in a thin film growth facility installed at beamline X21 of the National Synchrotron Light Source at Brookhaven National Laboratory and at beamline G3 of the Cornell High Energy Synchrotron Source, Cornell University. Measurements of grazing incidence small angle x-ray scattering (GISAXS) during the initial cycles of growth revealed a broadening and scattering near the diffuse specular rod and the development of scattering intensities due to half unit cell thick nucleation islands in the Yoneda wing with correlation length scale of 7.1 and 8.2 nm, at growth temperatures (Tg) of 200 and 248 °C, respectively. At about 1.1 nm (two unit cells) of growth thickness nucleation islands coarsen, grow, and the intensity of correlated scattering peak increased at the correlation length scale of 8.0 and 8.7 nm for Tg = 200 and 248 °C, respectively. The correlated peaks at both growth temperatures can be fitted with a single peak Lorentzian function, which support single mode growth. Post-growth in situ x-ray reflectivity measurements indicate a growth rate of ~0.36 Å/cycle consistent with the growth rate previously reported for self-limited InN growth in a commercial ALEp reactor. Consistent with the in situ GISAXS study, ex situ atomic force microscopy power spectral density measurements also indicate single mode growth. Electrical characterization of the resulting film revealed an electron mobility of 50 cm2/V s for a 5.6 nm thick InN film on a-plane sapphire, which is higher than the previously reported mobility of much thicker InN films grown at higher temperature by molecular beam epitaxy directly on sapphire. These early results indicated that in situ synchrotron x-ray study of the epitaxial growth kinetics of InN films is a very powerful method to

  9. Domain matched epitaxial growth of (111) Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} thin films on (0001) Al{sub 2}O{sub 3} with ZnO buffer layer

    Energy Technology Data Exchange (ETDEWEB)

    Krishnaprasad, P. S., E-mail: pskrishnaprasu@gmail.com, E-mail: mkj@cusat.ac.in; Jayaraj, M. K., E-mail: pskrishnaprasu@gmail.com, E-mail: mkj@cusat.ac.in [Department of Physics, Cochin University of Science and Technology, Kochi-22, Kerala (India); Antony, Aldrin [Department of Applied Physics and Optics, University of Barcelona, Barcelona (Spain); Department of Energy Science and Engineering, IIT Bombay, Mumbai (India); Rojas, Fredy [Department of Applied Physics and Optics, University of Barcelona, Barcelona (Spain)

    2015-03-28

    Epitaxial (111) Ba{sub 0.5}Sr{sub 0.5}TiO{sub 3} (BST) thin films have been grown by pulsed laser deposition on (0001) Al{sub 2}O{sub 3} substrate with ZnO as buffer layer. The x-ray ω-2θ, Φ-scan and reciprocal space mapping indicate epitaxial nature of BST thin films. The domain matched epitaxial growth of BST thin films over ZnO buffer layer was confirmed using Fourier filtered high resolution transmission electron microscope images of the film-buffer interface. The incorporation of ZnO buffer layer effectively suppressed the lattice mismatch and promoted domain matched epitaxial growth of BST thin films. Coplanar inter digital capacitors fabricated on epitaxial (111) BST thin films show significantly improved tunable performance over polycrystalline thin films.

  10. Epitaxial Silicon Doped With Antimony

    Science.gov (United States)

    Huffman, James E.; Halleck, Bradley L.

    1996-01-01

    High-purity epitaxial silicon doped with antimony made by chemical vapor deposition, using antimony pentachloride (SbCI5) as source of dopant and SiH4, SiCI2H2, or another conventional source of silicon. High purity achieved in layers of arbitrary thickness. Epitaxial silicon doped with antimony needed to fabricate impurity-band-conduction photodetectors operating at wavelengths from 2.5 to 40 micrometers.

  11. Temperature- and Al/N ratio-dependent AlN seed layer formation on (110) Si substrates by using plasma-assisted molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Noh, Young-Kyun; Park, Chul-Hyun; Oh, Jae-Eung [Hanyang University, Ansan (Korea, Republic of); Lee, Sang-Tae; Kim, Moon-Deock [Chungnam National University, Daejeon (Korea, Republic of)

    2014-05-15

    AlN seed layers with a thickness of 50 nm were grown by using nitrogen plasma-assisted molecular beam epitaxy on (110) Si substrates with different V/III ratios in the temperature range from 850 .deg. C to 940 .deg. C. In varying the Al/N ratio and the growth temperature, distinct surface morphologies emerge, which are quite different from those observed in AlN growth on (111) Si substrates. Under N-rich conditions, AlN films exhibits randomly distributed islands with different sizes ranging from 10 nm to 1 m. In Al-rich conditions, two distinct surface morphologies, (1) closely-packed islands preferentially aligned along the [1120]{sub AIN} /[110]{sub Si} azimuth and (2) smooth flat surfaces, are observed at various growth temperatures. The observed morphology transition is attributed to the asymmetric strain distribution between hexagonal symmetric AlN layers and rectangular (110) Si substrates and to varying surface adatom migration rates present at different growth temperatures.

  12. Influence of incoherent twin boundaries on the electrical properties of β-Ga2O3 layers homoepitaxially grown by metal-organic vapor phase epitaxy

    Science.gov (United States)

    Fiedler, A.; Schewski, R.; Baldini, M.; Galazka, Z.; Wagner, G.; Albrecht, M.; Irmscher, K.

    2017-10-01

    We present a quantitative model that addresses the influence of incoherent twin boundaries on the electrical properties in β-Ga2O3. This model can explain the mobility collapse below a threshold electron concentration of 1 × 1018 cm-3 as well as partly the low doping efficiency in β-Ga2O3 layers grown homoepitaxially by metal-organic vapor phase epitaxy on (100) substrates of only slight off-orientation. A structural analysis by transmission electron microscopy (TEM) reveals a high density of twin lamellae in these layers. In contrast to the coherent twin boundaries parallel to the (100) plane, the lateral incoherent twin boundaries exhibit one dangling bond per unit cell that acts as an acceptor-like electron trap. Since the twin lamellae are thin, we consider the incoherent twin boundaries to be line defects with a density of 1011-1012 cm-2 as determined by TEM. We estimate the influence of the incoherent twin boundaries on the electrical transport properties by adapting Read's model of charged dislocations. Our calculations quantitatively confirm that the mobility reduction and collapse as well as partly the compensation are due to the presence of twin lamellae.

  13. Origin of the 2.45 eV luminescence band observed in ZnO epitaxial layers grown on c-plane sapphire by chemical vapour deposition

    Science.gov (United States)

    Saroj, R. K.; Dhar, S.

    2014-12-01

    Zinc oxide epitaxial layers have been grown on c-plane sapphire substrates by the chemical vapour deposition (CVD) technique. A structural study shows (0001)-oriented films with good crystalline quality. The temperature and excitation power dependence of the photoluminescence (PL) characteristics of these layers is studied as a function of various growth parameters, such as the growth temperature, oxygen flow rate and Zn flux, which suggest that the origin of the broad visible luminescence (VL), which peaks at 2.45 eV, is the transition between the conduction band and the Zn vacancy acceptor states. A bound excitonic transition observed at 3.32 eV in low temperature PL has been identified as an exciton bound to the neutral Zn vacancy. Our study also reveals the involvement of two activation processes in the dynamics of VL, which has been explained in terms of the fluctuation of the capture barrier height for the holes trapped in Zn vacancy acceptors. The fluctuation, which might be a result of the inhomogeneous distribution of Zn vacancies, is found to be associated with an average height of 7 and 90 meV, respectively, for the local and global maxima.

  14. Dislocation density and strain-relaxation in Ge1-xSnx layers grown on Ge/Si (0 0 1) by low-temperature molecular beam epitaxy

    Science.gov (United States)

    Khiangte, Krista R.; Rathore, Jaswant S.; Sharma, Vaibhav; Bhunia, Swagata; Das, Sudipta; Fandan, Rajveer S.; Pokharia, Ravinder S.; Laha, Apurba; Mahapatra, Suddhasatta

    2017-07-01

    The density and origin of dislocations in a variety of molecular-beam-epitaxy-(MBE)-grown Ge1-xSnx/Ge/Si (0 0 1) heterostructures, with Sn-content varying from 0.4 to 5.2%, have been investigated systematically by high resolution X-ray diffraction (HRXRD). In particular, using the approach due to Kaganer et al. (V.M. Kaganer et al., Phys. Rev. B 72, 045423 (2005)) for the first time to the Ge1-xSnx alloy, it is demonstrated that reliable estimates of both edge and screw dislocation densities can be obtained from HRXRD data. Based on the correlations of strain relaxation and dislocation densities of the alloy epilayers and the underlying Ge buffer layers, we observe that dislocations threading from the latter predominantly contribute to the strain relaxation of the former. Thus, Ge1-xSnx epilayers of sub-critical thicknesses can be made to relax significantly by growing them on partially-relaxed, relatively-thin Ge buffer layers. This may be promising for the realization of Ge1-xSnx epilayers with direct electronic band gap.

  15. Contributed Review: Experimental characterization of inverse piezoelectric strain in GaN HEMTs via micro-Raman spectroscopy

    Energy Technology Data Exchange (ETDEWEB)

    Bagnall, Kevin R.; Wang, Evelyn N. [Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States)

    2016-06-15

    Micro-Raman thermography is one of the most popular techniques for measuring local temperature rise in gallium nitride (GaN) high electron mobility transistors with high spatial and temporal resolution. However, accurate temperature measurements based on changes in the Stokes peak positions of the GaN epitaxial layers require properly accounting for the stress and/or strain induced by the inverse piezoelectric effect. It is common practice to use the pinched OFF state as the unpowered reference for temperature measurements because the vertical electric field in the GaN buffer that induces inverse piezoelectric stress/strain is relatively independent of the gate bias. Although this approach has yielded temperature measurements that agree with those derived from the Stokes/anti-Stokes ratio and thermal models, there has been significant difficulty in quantifying the mechanical state of the GaN buffer in the pinched OFF state from changes in the Raman spectra. In this paper, we review the experimental technique of micro-Raman thermography and derive expressions for the detailed dependence of the Raman peak positions on strain, stress, and electric field components in wurtzite GaN. We also use a combination of semiconductor device modeling and electro-mechanical modeling to predict the stress and strain induced by the inverse piezoelectric effect. Based on the insights gained from our electro-mechanical model and the best values of material properties in the literature, we analyze changes in the E{sub 2} high and A{sub 1} (LO) Raman peaks and demonstrate that there are major quantitative discrepancies between measured and modeled values of inverse piezoelectric stress and strain. We examine many of the hypotheses offered in the literature for these discrepancies but conclude that none of them satisfactorily resolves these discrepancies. Further research is needed to determine whether the electric field components could be affecting the phonon frequencies apart from the

  16. Epitaxy of Semiconductors Introduction to Physical Principles

    CERN Document Server

    Pohl, Udo W

    2013-01-01

    Introduction to Epitaxy provides the essential information for a comprehensive upper-level graduate course treating the crystalline growth of semiconductor heterostructures. Heteroepitaxy represents the basis of advanced electronic and optoelectronic devices today and is considered one of the top fields in materials research. The book covers the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and the description of the major growth techniques metalorganic vapor phase epitaxy, molecular beam epitaxy and liquid phase epitaxy. Cubic semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures and processes during nucleation and growth are treated in detail. The Introduction to Epitaxy requires only little knowledge on solid-state physics. Students of natural sciences, materials science and electrical engineering as well as their lecturers benefit from elementary introductions t...

  17. Understanding GaN/InGaN core–shell growth towards high quality factor whispering gallery modes from non-polar InGaN quantum wells on GaN rods

    Science.gov (United States)

    Tessarek, C.; Rechberger, S.; Dieker, C.; Heilmann, M.; Spiecker, E.; Christiansen, S.

    2017-12-01

    GaN microrods are used as a basis for subsequent InGaN quantum well (QW) and quantum dot deposition by metal-organic vapor phase epitaxy. The coverage of the shell along the sidewall of rods is dependent on the rod growth time and a complete coverage is obtained for shorter rod growth times. Transmission electron microscopy measurements are performed to reveal the structural properties of the InGaN layer on the sidewall facet and on the top facet. The presence of layers in the microrod and on the microrod surface will be discussed with respect to GaN and InGaN growth. A detailed model will be presented explaining the formation of multiple SiN layers and the partial and full coverage of the shell around the core. Cathodoluminescence measurements are performed to analyze the InGaN emission properties along the microrod and to study the microresonator properties of such hexagonal core–shell structures. High quality factor whispering gallery modes with Q∼ 1200 are reported for the first time in a GaN microrod/InGaN non-polar QW core–shell geometry. The GaN/InGaN core–shell microrods are expected to be promising building blocks for low-threshold laser diodes and ultra-sensitive optical sensors.

  18. Magnesium doped GaN grown by MOCVD

    Energy Technology Data Exchange (ETDEWEB)

    Guarneros, C., E-mail: cesyga@yahoo.com.mx [Ingenieria Electrica, Seccion Electronica del Estado Solido, Centro de Investigacion y de Estudios Avanzados del Instituto Politecnico Nacional, Av. I.P.N. 2508, San Pedro Zacatenco, 07360 Mexico, D.F. (Mexico); Sanchez, V. [Ingenieria Electrica, Seccion Electronica del Estado Solido, Centro de Investigacion y de Estudios Avanzados del Instituto Politecnico Nacional, Av. I.P.N. 2508, San Pedro Zacatenco, 07360 Mexico, D.F. (Mexico)

    2010-10-25

    We have studied the optical and electrical characteristics of undoped and doped GaN layers. The n- and p-type layers have been prepared by low pressure MOCVD technique. Photoluminescence (PL) studies were carried at low temperature. In the PL spectra of undoped GaN layer, a low intensity band edge emission and a broad yellow emission band were observed. The donor-acceptor pair (DAP) emission and its phonon replicas were observed in Mg lightly doped GaN layer. The dominance of the blue and the yellow emissions increased in the PL spectra as the Mg concentration was increased. The X-ray diffraction was employed to study the structure of the layers. Both the undoped and the doped layers exhibited hexagonal structure. The samples were annealed and significant changes were not observed in Hall Effect and in the PL measurements, so we suggest that there is no need of a thermal annealing for magnesium acceptor activation.

  19. Investigation and comparison of GaN nanowire nucleation and growth by the catalyst-assisted and self-induced approaches

    Energy Technology Data Exchange (ETDEWEB)

    Cheze, Caroline

    2010-03-04

    This work focuses on the nucleation and growth mechanisms of GaN nanowires (NWs) by molecular beam epitaxy (MBE). The two main novelties of this study are the intensive employment of in-situ techniques and the direct comparison of selfinduced and catalyst-induced NWs. On silicon substrates, GaN NWs form in MBE without the use of any external catalyst seed. On sapphire, in contrast, NWs grow under identical conditions only in the presence of Ni seeds. NW nucleation was studied in situ by reflection high-energy electron diffraction (RHEED) in correlation with line-of-sight quadrupole mass spectrometry (QMS). The latter technique allows to monitor the incorporated amount of Ga. For the catalyst-assisted approach, three nucleation stages were identified: first incorporation of Ga into the Ni seeds, second transformation of the seed crystal structure due to Ga accumulation, and last GaN growth under the seeds. The crystalline structure of the seeds during the first two stages is in accord with the Ni-Ga binary phase diagram and evidenced that only Ga incorporates into the Ni particles. GaN forms only after the Ga concentration is larger than the one of Ni. The observation of diffraction patterns generated by the Ni-Ga seed particles during the whole nucleation evidences the solid state of the seeds. Moreover, the QMS study showed that it is not Ga incorporation into Ni but GaN nucleation itself that limits the growth processes. For the self-induced NWs, QMS and RHEED investigations indicate very similar nucleation processes on Si(001) and Si(111) and two nucleation stages were identified. Transmission electron microscopy on samples grown on Si(001) revealed that the first stage is characterized by the competition between the nucleation of crystalline Si{sub x}N{sub y} and GaN. During this stage, the Si surface strongly roughens by the formation of pits and Si mounds. At the same time, very few GaN islands nucleate. During the second stage, the amorphization of the Si

  20. Growth models of GaN thin films based on crystal chemistry: hexagonal and cubic GaN on Si substrates

    Science.gov (United States)

    Ohsato, Hitoshi; Razeghi, Manijeh

    1997-04-01

    We have been presented crystallographic growth models of GaN thin films on the (alpha) -Al2O3 substrates based on the crystal chemistry: electronegativity, chemical bonds, Pouling's rules in the background of mineralogy. We have introduced an extended atomic distance mismatch in crystal growth models and reported epitaxial growth models and reported epitaxial growth model with edge-type dislocation and bridge-type model growing with some roots contacting with substrates. In this paper, we presented growth models of GaN on Si substrates for an example of crystallographic growth model of thin film and discussed the growth conditions of different hexagonal and cubic phases. Crystal chemistry should have been performed effectively on the same aspects of epitaxial growth.

  1. Dislocation filtering in GaN nanostructures.

    Science.gov (United States)

    Colby, Robert; Liang, Zhiwen; Wildeson, Isaac H; Ewoldt, David A; Sands, Timothy D; García, R Edwin; Stach, Eric A

    2010-05-12

    Dislocation filtering in GaN by selective area growth through a nanoporous template is examined both by transmission electron microscopy and numerical modeling. These nanorods grow epitaxially from the (0001)-oriented GaN underlayer through the approximately 100 nm thick template and naturally terminate with hexagonal pyramid-shaped caps. It is demonstrated that for a certain window of geometric parameters a threading dislocation growing within a GaN nanorod is likely to be excluded by the strong image forces of the nearby free surfaces. Approximately 3000 nanorods were examined in cross-section, including growth through 50 and 80 nm diameter pores. The very few threading dislocations not filtered by the template turn toward a free surface within the nanorod, exiting less than 50 nm past the base of the template. The potential active region for light-emitting diode devices based on these nanorods would have been entirely free of threading dislocations for all samples examined. A greater than 2 orders of magnitude reduction in threading dislocation density can be surmised from a data set of this size. A finite element-based implementation of the eigenstrain model was employed to corroborate the experimentally observed data and examine a larger range of potential nanorod geometries, providing a simple map of the different regimes of dislocation filtering for this class of GaN nanorods. These results indicate that nanostructured semiconductor materials are effective at eliminating deleterious extended defects, as necessary to enhance the optoelectronic performance and device lifetimes compared to conventional planar heterostructures.

  2. Beyond van der Waals Interaction: The Case of MoSe2Epitaxially Grown on Few-Layer Graphene.

    Science.gov (United States)

    Dau, Minh Tuan; Gay, Maxime; Di Felice, Daniela; Vergnaud, Céline; Marty, Alain; Beigné, Cyrille; Renaud, Gilles; Renault, Olivier; Mallet, Pierre; Le Quang, Toai; Veuillen, Jean-Yves; Huder, Loïc; Renard, Vincent T; Chapelier, Claude; Zamborlini, Giovanni; Jugovac, Matteo; Feyer, Vitaliy; Dappe, Yannick J; Pochet, Pascal; Jamet, Matthieu

    2018-02-06

    Van der Waals heterojunctions composed of graphene and transition metal dichalcogenides have gain much attention because of the possibility to control and tailor band structure, promising applications in two-dimensional optoelectronics and electronics. In this report, we characterized the van der Waals heterojunction MoSe 2 /few-layer graphene with a high-quality interface using cutting-edge surface techniques scaling from atomic to microscopic range. These surface analyses gave us a complete picture of the atomic structure and electronic properties of the heterojunction. In particular, we found two important results: the commensurability between the MoSe 2 and few-layer graphene lattices and a band-gap opening in the few-layer graphene. The band gap is as large as 250 meV, and we ascribed it to an interface charge transfer that results in an electronic depletion in the few-layer graphene. This conclusion is well supported by electron spectroscopy data and density functional theory calculations. The commensurability between the MoSe 2 and graphene lattices as well as the band-gap opening clearly show that the interlayer interaction goes beyond the simple van der Waals interaction. Hence, stacking two-dimensional materials in van der Waals heterojunctions enables us to tailor the atomic and electronic properties of individual layers. It also permits the introduction of a band gap in few-layer graphene by interface charge transfer.

  3. High quality boron-doped epitaxial layers grown at 200°C from SiF4/H2/Ar gas mixtures for emitter formation in crystalline silicon solar cells

    Science.gov (United States)

    Léal, Ronan; Haddad, Farah; Poulain, Gilles; Maurice, Jean-Luc; Roca i Cabarrocas, Pere

    2017-02-01

    Controlling the doping profile in solar cells emitter and front/back surface field is mandatory to reach high efficiencies. In the current state of the art, these doped layers are made by dopant diffusion at around 900°C, which implies potential temperature induced damages in the c-Si absorber and for which a precise control of doping is difficult. An alternative solution based on boron-doped epitaxial silicon layers grown by plasma-enhanced chemical vapor deposition (PECVD) from 200°C using SiF4/H2/Ar/B2H6 chemistry is reported. The structural properties of the doped and undoped epitaxial layers were assessed by spectroscopic ellipsometry (SE), high resolution transmission electron microscopy (HR-TEM) and X-ray diffraction (XRD). The incorporation of boron has been studied via plasma profiling time of flight mass spectrometry (PP-TOFMS) and secondary ion mass spectrometry (SIMS) measurements. The boron-doped epitaxial layers revealed excellent structural and electrical properties even for high carrier concentrations (>1019cm-3). Sheet resistances between 100 and 130 Ω/sq can been obtained depending on the thickness and the doping concentration, which is within the range of targeted values for emitters in c-Si solar cells. Electrochemical capacitance voltage (ECV) revealed a uniform doping profile around 3.1019 cm-3 and by comparing with SIMS measurement a doping efficiency around 50% has been found.

  4. High quality boron-doped epitaxial layers grown at 200°C from SiF4/H2/Ar gas mixtures for emitter formation in crystalline silicon solar cells

    Directory of Open Access Journals (Sweden)

    Ronan Léal

    2017-02-01

    Full Text Available Controlling the doping profile in solar cells emitter and front/back surface field is mandatory to reach high efficiencies. In the current state of the art, these doped layers are made by dopant diffusion at around 900°C, which implies potential temperature induced damages in the c-Si absorber and for which a precise control of doping is difficult. An alternative solution based on boron-doped epitaxial silicon layers grown by plasma-enhanced chemical vapor deposition (PECVD from 200°C using SiF4/H2/Ar/B2H6 chemistry is reported. The structural properties of the doped and undoped epitaxial layers were assessed by spectroscopic ellipsometry (SE, high resolution transmission electron microscopy (HR-TEM and X-ray diffraction (XRD. The incorporation of boron has been studied via plasma profiling time of flight mass spectrometry (PP-TOFMS and secondary ion mass spectrometry (SIMS measurements. The boron-doped epitaxial layers revealed excellent structural and electrical properties even for high carrier concentrations (>1019cm-3. Sheet resistances between 100 and 130 Ω/sq can been obtained depending on the thickness and the doping concentration, which is within the range of targeted values for emitters in c-Si solar cells. Electrochemical capacitance voltage (ECV revealed a uniform doping profile around 3.1019 cm-3 and by comparing with SIMS measurement a doping efficiency around 50% has been found.

  5. Microstructure of non-polar GaN on LiGaO2 grown by plasma-assisted MBE

    Directory of Open Access Journals (Sweden)

    Huang Teng-Hsing

    2011-01-01

    Full Text Available Abstract We have investigated the structure of non-polar GaN, both on the M - and A-plane, grown on LiGaO2 by plasma-assisted molecular beam epitaxy. The epitaxial relationship and the microstructure of the GaN films are investigated by transmission electron microscopy (TEM. The already reported epi-taxial relationship and for M -plane GaN is confirmed. The main defects are threading dislocations and stacking faults in both samples. For the M -plane sample, the density of threading dislocations is around 1 × 1011 cm-2 and the stacking fault density amounts to approximately 2 × 105 cm-1. In the A-plane sample, a threading dislocation density in the same order was found, while the stacking fault density is much lower than in the M -plane sample.

  6. Microstructure of non-polar GaN on LiGaO2 grown by plasma-assisted MBE.

    Science.gov (United States)

    Shih, Cheng-Hung; Huang, Teng-Hsing; Schuber, Ralf; Chen, Yen-Liang; Chang, Liuwen; Lo, Ikai; Chou, Mitch Mc; Schaadt, Daniel M

    2011-06-15

    We have investigated the structure of non-polar GaN, both on the M - and A-plane, grown on LiGaO2 by plasma-assisted molecular beam epitaxy. The epitaxial relationship and the microstructure of the GaN films are investigated by transmission electron microscopy (TEM). The already reported epi-taxial relationship and for M -plane GaN is confirmed. The main defects are threading dislocations and stacking faults in both samples. For the M -plane sample, the density of threading dislocations is around 1 × 1011 cm-2 and the stacking fault density amounts to approximately 2 × 105 cm-1. In the A-plane sample, a threading dislocation density in the same order was found, while the stacking fault density is much lower than in the M -plane sample.

  7. Surface and interface properties of polar gallium nitride layers; Oberflaechen- und Grenzflaecheneigenschaften von polaren Galliumnitrid-Schichten

    Energy Technology Data Exchange (ETDEWEB)

    Lorenz, Pierre

    2010-07-09

    The material properties of group III-nitrides allows manifold applications. Especially for the GaN-based gas and biosensor technology, an understanding of the GaN surfaces and their interaction with molecules is crucial for the successful development of sensor systems. Especially the influence of crystal orientation, surface termination and reconstruction on the interaction was analysed. To study the interaction of the GaN surface with molecules the reproducible and controllable preparation of GaN surfaces is necessary. Polar GaN layers were grown by molecular beam epitaxy. The surface reconstruction and termination could be selectively adjusted by the growth parameters or further preparation steps. On the Ga-polar surface, gallium-induced and nitrogen-induced 2 x 2 reconstructed as well as non-reconstructed surface modifications could be generated and on the N-polar surface non-reconstructed. The different surface modifications differ considerably in the formation of surface states. The Ga-induced and N-induced 2 x 2 reconstructed surfaces presented two surface states (SS) at 1.4 eV and 3 eV as well as 2 eV and 3 eV, respectively. The non-reconstructed GaN(0001) presented three SS (1.5 eV, 2.5 eV and 3.4 eV) and the GaN(000-1) one SS (2.5 eV). The theoretical predicted surfaces sates (density functional theory) shows a good agreement with the measurements. The analysis revealed a dependence of the interaction of GaN surfaces with O{sub 2} and H{sub 2}O on the orientation, reconstruction, and surface termination of the films. The GaN(000-1) surface is much more reactive to oxygen and water than the (0001) orientated surfaces, while GaN is in general significantly more sensitive to water than to oxygen. The chemical bond configuration of the adsorbed species shows a significant dependence on surface termination. The measurements presented that the formation of nitrogen oxide and/or gallium oxide bonds depends on the surface modification. Furthermore the interaction

  8. Mosaic Structure Characterization of the AlInN Layer Grown on Sapphire Substrate

    Directory of Open Access Journals (Sweden)

    Engin Arslan

    2014-01-01

    Full Text Available The 150 nm thick, (0001 orientated wurtzite-phase Al1−xInxN epitaxial layers were grown by metal organic chemical vapor deposition on GaN (2.3 µm template/(0001 sapphire substrate. The indium (x concentration of the Al1−xInxN epitaxial layers was changed as 0.04, 0.18, 0.20, 0.47, and 0.48. The Indium content (x, lattice parameters, and strain values in the AlInN layers were calculated from the reciprocal lattice mapping around symmetric (0002 and asymmetric (10–15 reflection of the AlInN and GaN layers. The mosaic structure characteristics of the AlInN layers, such as lateral and vertical coherence lengths, tilt and twist angle, heterogeneous strain, and dislocation densities (edge and screw type dislocations of the AlInN epilayers, were investigated by using high-resolution X-ray diffraction measurements and with a combination of Williamson-Hall plot and the fitting of twist angles.

  9. Fabrication and Characterization of Micro-membrane GaN Light Emitting Diodes

    KAUST Repository

    Liao, Hsien-Yu

    2015-05-01

    Developing etching of GaN material system is the key to device fabrications. In this thesis, we report on the fabrication of high throughput lift-off of InGaN/GaN based micro-membrane light emitting diode (LED) from sapphire substrate using UV-assisted photoelectroless chemical (PEsC) etching. Unlike existing bandgap selective etching based on unconventional sacrificial layer, the current hydrofluoric acid based wet etching process enables the selective etching of undoped GaN layer already incorporated in standard commercial LED structures, thus attaining the leverage on high performance device design, and facile wet process technology. The lift-off micro-membrane LED showed 16% alleviated quantum efficiency droop under 200 mA/cm2 current injection, demonstrating the advantage of LED epitaxy exfoliation from the lattice-mismatched sapphire substrate. The origin of the performance improvement was investigated based on non-destructive characterization methods. Photoluminescence (PL) characterization showed a 7nm peak emission wavelength shift in the micro-membrane LED compared to the GaN-on-Sapphire LED. The Raman spectroscopy measurements correlate well with the PL observation that a 0.86 GPa relaxed compressive biaxial strain was achieved after the lift-off process. The micro-membrane LED technology enables further heterogeneous integration for forming pixelated red, green, blue (RGB) display on flexible and transparent substrate. The development of discrete and membrane LEDs using nano-fiber paper as the current spreading layer was also explored for such integration.

  10. Strain Effects in Epitaxial VO2 Thin Films on Columnar Buffer-Layer TiO2/Al2O3 Virtual Substrates.

    Science.gov (United States)

    Breckenfeld, Eric; Kim, Heungsoo; Burgess, Katherine; Charipar, Nicholas; Cheng, Shu-Fan; Stroud, Rhonda; Piqué, Alberto

    2017-01-18

    Epitaxial VO2/TiO2 thin film heterostructures were grown on (100) (m-cut) Al2O3 substrates via pulsed laser deposition. We have demonstrated the ability to reduce the semiconductor-metal transition (SMT) temperature of VO2 to ∼44 °C while retaining a 4 order of magnitude SMT using the TiO2 buffer layer. A combination of electrical transport and X-ray diffraction reciprocal space mapping studies help examine the specific strain states of VO2/TiO2/Al2O3 heterostructures as a function of TiO2 film growth temperatures. Atomic force microscopy and transmission electron microscopy analyses show that the columnar microstructure present in TiO2 buffer films is responsible for the partially strained VO2 film behavior and subsequently favorable transport characteristics with a lower SMT temperature. Such findings are of crucial importance for both the technological implementation of the VO2 system, where reduction of its SMT temperature is widely sought, as well as the broader complex oxide community, where greater understanding of the evolution of microstructure, strain, and functional properties is a high priority.

  11. Carrier Lifetimes in Lightly-Doped p-Type 4H-SiC Epitaxial Layers Enhanced by Post-growth Processes and Surface Passivation

    Science.gov (United States)

    Okuda, T.; Miyazawa, T.; Tsuchida, H.; Kimoto, T.; Suda, J.

    2017-11-01

    We investigated limiting factors of carrier lifetimes and their enhancement by post-growth processes in lightly-doped p-type 4H-SiC epitaxial layers ( N A ˜ 2 × 1014 cm-3). We focused on bulk recombination, surface recombination, and interface recombination at the epilayer/substrate, respectively. The carrier lifetime of 2.8 μs in an as-grown epilayer was improved to 10 μs by the combination of VC-elimination processes and hydrogen annealing. By employing surface passivation with deposited SiO2 followed by POCl3 annealing, a long carrier lifetime of 16 μs was obtained in an oxidized epilayer. By investigating carrier lifetimes in a self-standing p-type epilayer, it was revealed that the interface recombination at the epilayer/substrate was smaller than the surface recombination on a bare surface. We found that the VC-elimination process, hydrogen annealing, and surface passivation are all important for improving carrier lifetimes in lightly-doped p-type epilayers.

  12. Efficiency improvement of GaN-based ultraviolet light-emitting diodes with reactive plasma deposited AlN nucleation layer on patterned sapphire substrate.

    Science.gov (United States)

    Lee, Chia-Yu; Tzou, An-Jye; Lin, Bing-Cheng; Lan, Yu-Pin; Chiu, Ching-Hsueh; Chi, Gou-Chung; Chen, Chi-Hsiang; Kuo, Hao-Chung; Lin, Ray-Ming; Chang, Chun-Yen

    2014-01-01

    The flip chip ultraviolet light-emitting diodes (FC UV-LEDs) with a wavelength of 365 nm are developed with the ex situ reactive plasma deposited (RPD) AlN nucleation layer on patterned sapphire substrate (PSS) by an atmospheric pressure metal-organic chemical vapor deposition (AP MOCVD). The ex situ RPD AlN nucleation layer can significantly reduce dislocation density and thus improve the crystal quality of the GaN epitaxial layers. Utilizing high-resolution X-ray diffraction, the full width at half maximum of the rocking curve shows that the crystalline quality of the epitaxial layer with the (RPD) AlN nucleation layer is better than that with the low-temperature GaN (LT-GaN) nucleation layer. The threading dislocation density (TDD) is estimated by transmission electron microscopy (TEM), which shows the reduction from 6.8 × 10(7) cm(-2) to 2.6 × 10(7) cm(-2). Furthermore, the light output power (LOP) of the LEDs with the RPD AlN nucleation layer has been improved up to 30 % at a forward current of 350 mA compared to that of the LEDs grown on PSS with conventional LT-GaN nucleation layer.

  13. Metal-organic-vapor-phase-epitaxy and characterization of homoepitaxial ZnO-layers; Metallorganische Gasphasenepitaxie und Charakteriesierung homoepitaktischer ZnO-Schichten

    Energy Technology Data Exchange (ETDEWEB)

    Heinze, Soeren

    2009-03-30

    ZnO is a direct semiconductor with a band gap of 3.37 eV and an exciton binding energy of about 60 meV. By alloying with cadmium or magnesium the band gap can be varied between 2.9 eV and 4 eV, which makes the realization of for instance quantum pot structures. Therefore ZnO is a promising material for optoelectronic applications in the blue and near-ultraviolet spectral range. In spite of world-wide numerous research activities over the last years the realization of p-type ZnO could indeed not sufficiently (i.e. reproduceable and long-time stably) be solved. The ZnO layers of this thesis were fabricated by means of metalorganic gas-phase epitaxy. By means of the studies on heteroepitactically deposed, undoped layers I show the limits of the heteroepitaxy. Although in doping attempts no p-type ZnO could be fabricated. By introduction of a three-stage growth procedure physical properties (morphology, luminescence, crystallographic and electric properties) of the upper ZnO layer could be distinctly improved. On the other hand it was proved that during the fabrication process an electrically high-conductive intermediate layer in the neighbourhood of the substrate/ZnO interface is formed, the formation of which cannot be avoided in the heteroepitaxy. Since about three years ZnO substrates with very good quality are commercially available. Therefore the essential part of this thesis tracts my works on the homoepitaxy of ZnO. For a successful homoepitactical growth a thermal pre-treatment (annealing) of the substrate is necessary. Thereby the substrate is located in a surrounding of ZnO powder and an oxygen atmosphere. The optimal tempering conditions were determined and the influence of these pre-treatment on the physical properties of the substrated were detailedly studied. After the annealing the substrates are suited for the epitaxy. The experiences from the heteroepitaxy could not without more ado be transferred to the homoepitaxy. The quality of the homoepitactical

  14. Structure, reactivity, electronic configuration and magnetism of samarium atomic layers deposited on Si(0 0 1) by molecular beam epitaxy

    Energy Technology Data Exchange (ETDEWEB)

    Gheorghe, Nicoleta G.; Lungu, George A.; Husanu, Marius A.; Costescu, Ruxandra M.; Macovei, Dan [National Institute of Materials Physics, Atomistilor 105 b, 077125 Magurele-Ilfov (Romania); Teodorescu, Cristian M., E-mail: teodorescu@infim.ro [National Institute of Materials Physics, Atomistilor 105 b, 077125 Magurele-Ilfov (Romania)

    2013-02-15

    The surface structure, interface reactivity, electron configuration and magnetic properties of Sm layers deposited on Si(0 0 1) at various temperatures are investigated by low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS), X-ray absorption spectroscopy (XAS) and magneto-optical Kerr effect (MOKE). It is found that metal Sm is present on samples prepared at low temperature, with an interface layer containing SmSi{sub 2} and Sm{sub 4}Si{sub 3}. When samples are prepared at high temperature, much less metal Sm is found, with an increasing amount of SmSi{sub 2}. Room temperature ferromagnetism is observed for all prepared layers, with a decrease of the saturation magnetization when samples are prepared at high temperature. It is found that ferromagnetism implies mostly a compound with approximate stoichiometry Sm{sub 4}Si{sub 3}. Also, the decrease in the intensity of the XAS 2p{sub 3/2} → 3d white lines with the corresponding increasing amount of SmSi{sub 2} may be explained by assuming a higher occupancy of Sm 5d orbitals (5d{sup 2} configuration), most probably due to hybridation effects.

  15. Scale-up of the chemical lift-off of (In)GaN-based p-i-n junctions from sapphire substrates using sacrificial ZnO template layers

    Science.gov (United States)

    Rogers, D. J.; Sundaram, S.; El Gmili, Y.; Teherani, F. Hosseini; Bove, P.; Sandana, V.; Voss, P. L.; Ougazzaden, A.; Rajan, A.; Prior, K. A.; McClintock, R.; Razeghi, M.

    2014-03-01

    (In)GaN p-i-n structures were grown by MOVPE on both GaN- and ZnO-coated c-sapphire substrates. XRD studies of the as-grown layers revealed that a strongly c-axis oriented wurtzite crystal structure was obtained on both templates and that there was a slight compressive strain in the ZnO underlayer which increased after GaN overgrowth. The InGaN peak position gave an estimate of 13.6at% for the indium content in the active layer. SEM and AFM revealed that the top surface morphologies were similar for both substrates, with an RMS roughness (5 μm x 5 μm) of about 10 nm. Granularity appeared slightly coarser (40nm for the device grown on ZnO vs 30nm for the device grown on the GaN template) however. CL revealed a weaker GaN near band edge UV emission peak and a stronger broad defect-related visible emission band for the structure grown on the GaN template. Only a strong ZnO NBE UV emission was observed for the sample grown on the ZnO template. Quarter-wafer chemical lift-off (CLO) of the InGaN-based p-i-n structures from the sapphire substrate was achieved by temporary-bonding the GaN surface to rigid glass support with wax and then selectively dissolving the ZnO in 0.1M HCl. XRD studies revealed that the epitaxial nature and strong preferential c-axis orientation of the layers had been maintained after lift-off. This demonstration of CLO scale-up, without compromising the crystallographic integrity of the (In)GaN p-i-n structure opens up the perspective of transferring GaN based devices off of sapphire substrates industrially.

  16. Molecular beam epitaxy of strained-layer InAs/GaInSb superlattices for long-wavelength photodetectors

    Science.gov (United States)

    Patrashin, Mikhail; Akahane, Kouichi; Sekine, Norihiko; Hosako, Iwao

    2017-11-01

    We report on the growth and characterization of strained-layer InAs/Ga1-xInxSb superlattices for long-wavelength photodetectors. The thickness and alloy composition x X-ray diffraction, scanning transmission electron microscopy, energy-dispersive spectroscopy, and Rutherford backscattering spectroscopy. Transmittance and reflectance spectra were measured to evaluate the optical properties. The characterization results demonstrated the feasibility of the pseudomorphic growth of strained InAs/GaInSb superlattices and their promising optical properties for long-wavelength photodetectors.

  17. Identifying threading dislocations in GaN films and substrates by electron channelling.

    Science.gov (United States)

    Kamaladasa, Ranga J; Liu, Fang; Porter, Lisa M; Davis, Robert F; Koleske, Daniel D; Mulholland, Greg; Jones, Kenneth A; Picard, Yoosuf N

    2011-12-01

    Electron channelling contrast imaging of threading dislocations in GaN (0002) substrates and epitaxial films has been demonstrated using a conventional polepiece-mounted backscatter detector in a commercial scanning electron microscope. The influence of accelerating voltage and diffraction vector on contrast features denoting specific threading dislocation types has been studied. As confirmed by coordinated transmission electron microscopy analysis, electron channelling contrast imaging contrast features for edge-type threading dislocations are spatially smaller than mixed-type threading dislocations in GaN. This ability to delineate GaN edge threading dislocations from mixed type was also confirmed by defect-selective etch processing using molten MgO/KOH. This study validates electron channelling contrast imaging as a nondestructive and widely accessible method for spatially mapping and identifying dislocations in GaN with wider applicability for other single-crystal materials. © 2011 The Authors Journal of Microscopy © 2011 Royal Microscopical Society.

  18. Spatial distribution of dislocations in relation to a substructure in high-quality GaN film.

    Science.gov (United States)

    Yang, Mino; Kim, Chong-Don; Kim, Hee-Goo; Yang, Cheol-Woong

    2013-08-01

    The dislocation distribution of high-quality single-crystal gallium nitride (GaN) films grown by the hybrid vapor phase epitaxy was analyzed. This study examined the domain structure of GaN from the dislocation distribution on the macroscale by optical microscopy. The surface structure of GaN consisted of domains with microcolumns as the substructure. The inner domains contained a lower density of dislocations but a large number of these dislocations were observed along the domain boundaries. The existence of a domain boundary structure doubly increased the total dislocation density.

  19. Epitaxial CuInSe2 thin films grown by molecular beam epitaxy and migration enhanced epitaxy

    Science.gov (United States)

    Abderrafi, K.; Ribeiro-Andrade, R.; Nicoara, N.; Cerqueira, M. F.; Gonzalez Debs, M.; Limborço, H.; Salomé, P. M. P.; Gonzalez, J. C.; Briones, F.; Garcia, J. M.; Sadewasser, S.

    2017-10-01

    While CuInSe2 chalcopyrite materials are mainly used in their polycrystalline form to prepare thin film solar cells, epitaxial layers have been used for the characterization of defects. Typically, epitaxial layers are grown by metal-organic vapor phase epitaxy or molecular beam epitaxy (MBE). Here we present epitaxial layers grown by migration enhanced epitaxy (MEE) and compare the materials quality to MBE grown layers. CuInSe2 layers were grown on GaAs (0 0 1) substrates by co-evaporation of Cu, In, and Se using substrate temperatures of 450 °C, 530 °C, and 620 °C. The layers were characterized by high resolution X-ray diffraction (HR-XRD), high-resolution transmission electron microscopy (HRTEM), Raman spectroscopy, and atomic force microscopy (AFM). HR-XRD and HR-TEM show a better crystalline quality of the MEE grown layers, and Raman scattering measurements confirm single phase CuInSe2. AFM shows the previously observed faceting of the (0 0 1) surface into {1 1 2} facets with trenches formed along the [1 1 0] direction. The surface of MEE-grown samples appears smoother compared to MBE-grown samples, a similar trend is observed with increasing growth temperature.

  20. Kinetic Monte Carlo simulations of GaN homoepitaxy on c- and m-plane surfaces

    Science.gov (United States)

    Xu, Dongwei; Zapol, Peter; Stephenson, G. Brian; Thompson, Carol

    2017-04-01

    The surface orientation can have profound effects on the atomic-scale processes of crystal growth and is essential to such technologies as GaN-based light-emitting diodes and high-power electronics. We investigate the dependence of homoepitaxial growth mechanisms on the surface orientation of a hexagonal crystal using kinetic Monte Carlo simulations. To model GaN metal-organic vapor phase epitaxy, in which N species are supplied in excess, only Ga atoms on a hexagonal close-packed (HCP) lattice are considered. The results are thus potentially applicable to any HCP material. Growth behaviors on c-plane (0001) and m-plane (01 1 ¯ 0 ) surfaces are compared. We present a reciprocal space analysis of the surface morphology, which allows extraction of growth mode boundaries and direct comparison with surface X-ray diffraction experiments. For each orientation, we map the boundaries between 3-dimensional, layer-by-layer, and step flow growth modes as a function of temperature and growth rate. Two models for surface diffusion are used, which produce different effective Ehrlich-Schwoebel step-edge barriers and different adatom diffusion anisotropies on m-plane surfaces. Simulation results in agreement with observed GaN island morphologies and growth mode boundaries are obtained. These indicate that anisotropy of step edge energy, rather than adatom diffusion, is responsible for the elongated islands observed on m-plane surfaces. Island nucleation spacing obeys a power-law dependence on growth rate, with exponents of -0.24 and -0.29 for the m- and c-plane, respectively.