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Sample records for chemical mechanical polishing

  1. Tribology analysis of chemical-mechanical polishing

    Energy Technology Data Exchange (ETDEWEB)

    Runnels, S.R.; Eyman, L.M. (Sematech, Austin, TX (United States))

    1994-06-01

    To better understand the variation of material removal rate on a wafer during chemical-mechanical polishing (CMP), knowledge of the stress distribution on the wafer surface is required. The difference in wafer-surface stress distributions could be considerable depending on whether or not the wafer hydroplanes during polishing. This study analyzes the fluid film between the wafer and pad and demonstrates that hydroplaning is possible for standard CMP processes. The importance of wafer curvature, slurry viscosity, and rotation speed on the thickness of the fluid film is also demonstrated.

  2. Chemical mechanical polishing of freestanding GaN substrates

    Institute of Scientific and Technical Information of China (English)

    颜怀跃; 修向前; 刘战辉; 张荣; 华雪梅; 谢自力; 韩平; 施毅; 郑有炓

    2009-01-01

    Chemical mechanical polishing (CMP) has been used to produce smooth and scratch-free surfaces for GaN. In the aqueous solution of KOH, GaN is subjected to etching. At the same time, all surface irregularities, including etch pyramids, roughness after mechanical polishing and so on will be removed by a polishing pad. The experiments had been performed under the condition of different abrasive particle sizes of the polishing pad. Also the polishing results for different polishing times are analyzed, and chemical mechanical polishing resulted in an average root mean square (RMS) surface roughness of 0.565 nm, as measured by atomic force microscopy.

  3. Contribution of ultrasonic traveling wave to chemical-mechanical polishing.

    Science.gov (United States)

    Li, Liang; He, Qing; Zheng, Mian; Liu, Zheng

    2015-02-01

    The ultrasonic vibrators are introduced into the chemical-mechanical polishing devices, and in this polishing system, the ultrasonic vibrators generate ultrasonic traveling wave and keep coaxial with the polished silicon wafer rotating at given speed so as to compare the texture of the polished silicon wafers. And the experiments on the chemical-mechanical polishing with assisted ultrasonic vibration are accomplished in order to investigate the effect of the ultrasonic vibration on the chemical-mechanical polishing. Via comparing the roughness average of the two silicon wafers polished with assisted ultrasonic vibration and without assisted vibration, it is found that the morphology of the silicon wafer polished with assisted vibration is superior to that without assisted vibration, that is, this series of experiments indicate that the ultrasonic vibration is beneficial to the chemical-mechanical polishing. Aiming at understanding the contribution of the ultrasonic vibration to chemical-mechanical polishing in detail, the model of the chemical-mechanical polishing with the assisted ultrasonic vibration is built up, which establishes the relationship of the removal rate and the polishing variables such as the rotary speed of silicon wafers, the amplitude and the frequency of vibrators, the particle density of polishing slurry and the characteristics of polishing pad etc. This model not only could be used to explain the experimental results but also to illuminate the roles played by the polishing variables.

  4. Cation Effect on Copper Chemical Mechanical Polishing

    Institute of Scientific and Technical Information of China (English)

    WANG Liang-Yong; LIU Bo; SONG Zhi-Tang; FENG Song-Lin

    2009-01-01

    We examine the effect of cations in solutions containing benzotriazole (BTA) and H2O2 on copper chemical mechanical polishing (CMP). On the base of atomic force microscopy (AFM) and material removal rate (MRR) results, it is found that ammonia shows the highest MRR as well as good surface after CMP, while KOH demon-strates the worst performance. These results reveal a mechanism that sma//molecules with lone-pairs rather than molecules with steric effect and common inorganic cations are better for copper CMP process, which is indirectly confirmed by open circuit potential (OCP).

  5. Cation Effect on Copper Chemical Mechanical Polishing

    Science.gov (United States)

    Wang, Liang-Yong; Liu, Bo; Song, Zhi-Tang; Feng, Song-Lin

    2009-02-01

    We examine the effect of cations in solutions containing benzotriazole (BTA) and H2O2 on copper chemical mechanical polishing (CMP). On the base of atomic force microscopy (AFM) and material removal rate (MRR) results, it is found that ammonia shows the highest MRR as well as good surface after CMP, while KOH demonstrates the worst performance. These results reveal a mechanism that small molecules with lone-pairs rather than molecules with steric effect and common inorganic cations are better for copper CMP process, which is indirectly confirmed by open circuit potential (OCP).

  6. Copper chemical mechanical polishing using a slurry-free technique

    NARCIS (Netherlands)

    Nguyen, V.H.; Hof, A.J.; Kranenburg, van H.; Woerlee, P.H.; Weimar, F.

    2001-01-01

    A study of the chemical mechanical polishing (CMP) of thin copper films using fixed-abrasive pads is presented. The composition of the polishing solution is optimized by investigating the impact of both the oxidizer concentration and the pH of the solution on the polishing characteristics of copper.

  7. Defect centers in chemical-mechanical polished MOS oxides

    Energy Technology Data Exchange (ETDEWEB)

    Shaneyfelt, M.R.; Warren, W.L.; Hetherington, D.L.; Timon, R.P.; Resnick, P.J.; Winokur, P.S.

    1994-12-31

    Defect centers generated in vacuum-ultraviolet irradiated chemical-mechanical polished oxides have been characterized using electron paramagnetic resonance and C-V analysis. Both oxide trap E{sub {gamma}} and interface trap P{sub b0} centers were detected in unpolished and polished oxides. In addition, another interface defect center known as the P{sub b1} center was only identified in the polished oxides, suggesting that the polishing process altered the SiO{sub 2}/Si interface.

  8. Effect of Chemicals on Chemical Mechanical Polishing of Glass Substrates

    Institute of Scientific and Technical Information of China (English)

    WANG Liang-Yong; ZHANG Kai-Liang; SONG Zhi-Tang; FENG Song-Lin

    2007-01-01

    @@ We investigate the effect of chemicals on chemical mechanical polishing (CMP) of glass substrates. Ceria slurry in an ultra-low concentration of 0.25wt.% is used and characterized by scanning electron microscopy. Three typical molecules, i.e. acetic acid, citric acid and sodium acrylic polymer, are adopted to investigate the effect on CMP performance in terms of material removal rate (MRR) and surface quality. The addition of sodium acrylic polymer shows the highest MRR as well as the best surface by atomic force microscopy after CMP, vhile the addition of citric acid shows the worst performance. These results reveal a mechanism that a long-chain molecule without any branches rather than small molecules and common molecules with ramose abundant-electron groups is better for the dispersion of the slurry and thus better for the CMP process.

  9. Chemical mechanical polishing of tantalum and tantalum nitride

    Science.gov (United States)

    Janjam, Sathish Babu S. V.

    There is a continuing need in the semiconductor industry to clear residual copper (Cu) and planarize the tantalum (Ta)/tantalum nitride (TaN) barrier/etch stop layer with a higher removal rate using the technique of Chemical Mechanical Polishing (CMP). Obtaining high removal rates for Ta/TaN is very challenging as the films are very hard, and hence it is difficult to achieve high Ta/TaN removal rates by just relying on an increase in the mechanical forces (operating pressure) alone during CMP. Ta/TaN is an inert metal, therefore, obtaining high Ta/TaN removal rates by using chemical additives is also challenging. Not only Ta/TaN needs to be removed at a higher rate in the second step of polishing, but also remaining Cu should be cleared. It is important to search for novel chemicals that can form a thin film on the Ta/TaN surface which can be easily abraded by the polishing pad with very less pressure. In this work, oxalic and tartaric acids have been investigated as the complexing agents in slurries for Ta/TaN CMP. Oxalic and tartaric acids appear to be reactive with Ta in the presence of hydrogen peroxide. A dispersion of the Oxalic acid (OA)/Tartaric Acid (TA) - peroxide mixtures with silica (fumed/colloidal) can be used to achieve Ta removal rates that are ˜ 90 nm/min at pH between 3 to 6 by applying a down force of 6.3 psi, where as at a lower down force of 2 psi, a removal rate of ˜ 40 nm/min has been achieved at pH = 3. It was shown earlier that a high Cu removal rate can be obtained using OA-peroxide based slurries with/without the addition of abrasives at pH = 3 [1]. So, in the first step, Cu could be removed at high rates at pH = 3 and by changing the pH to 5 or 6, Ta/TaN can be removed as mentioned above. Hence these slurries could be used as "single dispersion slurries " that could be used for both the first and second steps of Cu CMP. During the second step (barrier layer polish), Cu removal rates are low but not low enough to minimize dishing with

  10. Modeling Chemical Mechanical Polishing with Couple Stress Fluids

    Institute of Scientific and Technical Information of China (English)

    张朝辉; 雒建斌; 温诗铸

    2004-01-01

    Chemical mechanical polishing (CMP) is a manufacturing process used to achieve high levels of global and local planarity.Currently, the slurries used in CMP usually contain nanoscale particles to accelerate the removal ratio and to optimize the planarity, whose rheological properties can no longer be accurately modeled with Newtonian fluids.The Reynolds equation, including the couple stress effects, was derived in this paper.The equation describes the mechanism to solve the CMP lubrication equation with the couple stress effects.The effects on load and moments resulting from the various parameters, such as pivot height, roll angle, and pitch angle, were subsequently simulated.The results show that the couple stress can provide higher load and angular moments.This study sheds some lights into the mechanism of the CMP process.

  11. Material removal model for non-contact chemical mechanical polishing

    Institute of Scientific and Technical Information of China (English)

    ZHANG JianQun; ZHANG ChaoHui

    2008-01-01

    Material removal mechanism under non-contact condition between the pad and the wafer in the chemical mechanical polishing (CMP) process is investigated. Based on the assumption that almost all effective material removals take place due to the active abrasives which cut material through the plowing effects. A novel model is developed to predict the material removal rate (MRR) under non-contact condition between the pad and the wafer in CMP. Validated by the experimental data, the model is proved to be able to predict the change of MRR under non-contact condition. Numerical simulation of the model shows: the relative velocity u between the pad and the wafer and fluid viscosity η are the most important factors which impact MRR under non-contact condition; load changes of wafer also affects the MRR, but the effect is not as obvious as the relative velocity and fluid viscosity;when the radius of abrasive is not less than 50nm, the impact of MRR alone with the changes in the size of the abrasive can be ignored.

  12. Chemical Mechanical Polishing of Ruthenium, Cobalt, and Black Diamond Films

    Science.gov (United States)

    Peethala, Brown Cornelius

    Ta/TaN bilayer serves as the diffusion barrier as well as the adhesion promoter between Cu and the dielectric in 32 nm technology devices. A key concern of future technology devices (sustain the diffusion barrier performance without forming voids and meeting the requirements of low resistivity. These are very challenging requirements for the Ta/TaN bilayer at a thickness of 50 nm/min) Ru removal rates (RRs) are required and as a stop layer in magnetic recording head fabrication where low (Diamond (BD) is a SiCOH type material with a dielectric constant of ˜2.9 and here, polishing of BD was investigated in order to understand the polishing behavior of SiCOH-based materials using the barrier slurries. The slurries that were developed for polishing Co and Ru in this work and Ta/TaN (earlier) were investigated for polishing the Black Diamond (BD) films. Here, it was found that ionic salts play a major role in enhancing the BD RRs to ˜65 nm/min compared to no removal rates in the absence of additives. A removal mechanism in the presence of ionic salts is proposed.

  13. Slurry Chemical Corrosion and Galvanic Corrosion during Copper Chemical Mechanical Polishing

    Science.gov (United States)

    Kondo, Seiichi; Sakuma, Noriyuki; Homma, Yoshio; Ohashi, Naofumi

    2000-11-01

    Copper (Cu) corrosion during chemical mechanical polishing (CMP) was controlled in order to improve the Cu damascene interconnect process. Slurry chemical corrosion was found to be enhanced when the slurry was diluted by deionized (DI) water during rinsing just after CMP@. Since the corrosion inhibitor, benzotriazole (BTA), reduces the Cu removal rate, adding it to the rinse solution prevents chemical corrosion more effectively than adding it to the slurry. On the other hand, galvanic corrosion occurs at the interface between Cu and the barrier metal, and it can be prevented by selecting appropriate barrier metals. Because the difference between the electrochemical potentials of Cu and the barrier metal is small in the slurry, refractory metals such as Ta, TaN, and TiN were found to be appropriate barrier metals. On the other hand, W, WN, and Ti have large potential differences, so galvanic corrosion was clearly observed when Cu/W damascene interconnects were fabricated.

  14. Chemical mechanical polishing of transparent conductive layers using spherical cationic polymer microbeads

    Energy Technology Data Exchange (ETDEWEB)

    Nagaoka, Shoji, E-mail: nagaoka@kmt-iri.go.jp [Kumamoto Industrial Research Institute, 3-11-38 Higashimachi, Higashiku, Kumamoto 862-0901 (Japan); Department of Applied Chemistry and Biochemistry, Kumamoto University, 2-39-1 Kurokami, Chuouku, Kumamoto 860-8555 (Japan); Kumamoto Institute for Photo-Electro Organics (Phoenics), 3-11-38 Higashimachi, Higashiku, Kumamoto 862-0901 (Japan); Ryu, Naoya [Kumamoto Industrial Research Institute, 3-11-38 Higashimachi, Higashiku, Kumamoto 862-0901 (Japan); Yamanouchi, Akio [Department of Applied Chemistry and Biochemistry, Kumamoto University, 2-39-1 Kurokami, Chuouku, Kumamoto 860-8555 (Japan); Shirosaki, Tomohiro [Kumamoto Industrial Research Institute, 3-11-38 Higashimachi, Higashiku, Kumamoto 862-0901 (Japan); Kumamoto Institute for Photo-Electro Organics (Phoenics), 3-11-38 Higashimachi, Higashiku, Kumamoto 862-0901 (Japan); Horikawa, Maki [Kumamoto Industrial Research Institute, 3-11-38 Higashimachi, Higashiku, Kumamoto 862-0901 (Japan); Department of Applied Chemistry and Biochemistry, Kumamoto University, 2-39-1 Kurokami, Chuouku, Kumamoto 860-8555 (Japan); Kumamoto Institute for Photo-Electro Organics (Phoenics), 3-11-38 Higashimachi, Higashiku, Kumamoto 862-0901 (Japan); Sakurai, Hideo; Takafuji, Makoto; Ihara, Hirotaka [Department of Applied Chemistry and Biochemistry, Kumamoto University, 2-39-1 Kurokami, Chuouku, Kumamoto 860-8555 (Japan); Kumamoto Institute for Photo-Electro Organics (Phoenics), 3-11-38 Higashimachi, Higashiku, Kumamoto 862-0901 (Japan)

    2015-02-02

    Spherical cationic polymer microbeads were used to chemically mechanically polish transparent conductive oxide (TCO) layers without the need for inorganic abrasives. Poly(methyl acrylate) (PMA) was used as the polymer matrix. Surface cationization of the spherical PMA microbeads was achieved by aminolysis using 1,2-diaminoethane. The amino group content of the microbeads was controlled using the aminolysis reaction time. The surface roughness of the TCO polished using the cationic polymer microbeads was similar to that of TCO polished with an inorganic abrasive. The microbead-polished TCO layer was slightly thinner than the unpolished TCO layer. The sheet resistance of the TCO layer polished using the microbeads was lower than that polished using the inorganic abrasive. The TCO polishing ability of the microbeads was dependent on their cationic properties and softness. - Highlights: • Indium tin oxide (ITO) layer was planarized using cationic polymer microbeads. • Cationic polymer microbeads planarized, while retaining ITO layer thickness • Cationic polymer microbeads did not degrade the sheet resistance of ITO. • Cationic polymer microbeads could planarize the ITO surface without damaging.

  15. Material removal mechanism of copper chemical mechanical polishing in a periodate-based slurry

    Science.gov (United States)

    Cheng, Jie; Wang, Tongqing; He, Yongyong; Lu, Xinchun

    2015-05-01

    The material removal mechanism of copper in a periodate-based slurry during barrier layer chemical mechanical polishing (CMP) has not been intensively investigated. This paper presents a study of the copper surface film chemistry and mechanics in a periodate-based slurry. On this basis, the controlling factor of the copper CMP material removal mechanism is proposed. The results show that the chemical and electrochemical reaction products on the copper surface are complex and vary considerably as a function of the solution pH. Under acidic conditions (pH 4) the copper surface underwent strong chemical dissolution while the corrosion was mild and uniform under alkaline conditions (pH 11). The corrosion effect was the lowest in near neutral solutions because the surface was covered with non-uniform Cu(IO3)2·H2O/Cu-periodate/copper oxides films, which had better passivation effect. The surface film thickness and mechanical removal properties were studied by AES and AFM nano-scratch tests. Based on the combined surface film analysis and CMP experiment results, it can be concluded that the controlling factor during copper CMP in a periodate-based slurry is the chemical-enhanced mechanical removal of the surface films. The periodate-based slurry should be modified by the addition of corrosion inhibitors and complexing agents to achieve a good copper surface quality with moderate chemical dissolution.

  16. Models of nanoparticles movement, collision, and friction in chemical mechanical polishing (CMP)

    Energy Technology Data Exchange (ETDEWEB)

    Ilie, Filip, E-mail: filip@meca.omtr.pub.ro [Polytechnic University of Bucharest, Department of Machine Elements and Tribology (Romania)

    2012-03-15

    Nanoparticles have been widely used in polishing slurry such as chemical mechanical polishing (CMP) process. The movement of nanoparticles in polishing slurry and the interaction between nanoparticles and solid surface are very important to obtain an atomic smooth surface in CMP process. Polishing slurry contains abrasive nanoparticles (with the size range of about 10-100 nm) and chemical reagents. Abrasive nanoparticles and hydrodynamic pressure are considered to cause the polishing effect. Nanoparticles behavior in the slurry with power-law viscosity shows great effect on the wafer surface in polishing process. CMP is now a standard process of integrated circuit manufacturing at nanoscale. Various models can dynamically predict the evolution of surface topography for any time point during CMP. To research, using a combination of individual nanoscale friction measurements for CMP of SiO{sub 2}, in an analytical model, to sum these effects, and the results scale CMP experiments, can guide the research and validate the model. CMP endpoint measurements, such as those from motor current traces, enable verification of model predictions, relating to friction and wear in CMP and surface topography evolution for different types of CMP processes and patterned chips. In this article, we explore models of the microscopic frictional force based on the surface topography and present both experimental and theoretical studies on the movement of nanoparticles in polishing slurry and collision between nanoparticles, as well as between the particles and solid surfaces in time of process CMP. Experimental results have proved that the nanoparticle size and slurry properties have great effects on the polishing results. The effects of the nanoparticle size and the slurry film thickness are also discussed.

  17. Combined Ultrasonic Elliptical Vibration and Chemical Mechanical Polishing of Monocrystalline Silicon

    Directory of Open Access Journals (Sweden)

    Liu Defu

    2016-01-01

    Full Text Available An ultrasonic elliptical vibration assisted chemical mechanical polishing(UEV-CMP is employed to achieve high material removal rate and high surface quality in the finishing of hard and brittle materials such as monocrystalline silicon, which combines the functions of conventional CMP and ultrasonic machining. In theultrasonic elliptical vibration aided chemical mechanical polishingexperimental setup developed by ourselves, the workpiece attached at the end of horn can vibrate simultaneously in both horizontal and vertical directions. Polishing experiments are carried out involving monocrystalline silicon to confirm the performance of the proposed UEV-CMP. The experimental results reveal that the ultrasonic elliptical vibration can increase significantly the material removal rate and reduce dramatically the surface roughness of monocrystalline silicon. It is found that the removal rate of monocrystalline silicon polished by UEV-CMP is increased by approximately 110% relative to that of conventional CMP because a passive layer on the monocrystalline silicon surface, formed by the chemical action of the polishing slurry, will be removed not only by the mechanical action of CMP but also by ultrasonic vibration action. It indicates that the high efficiency and high quality CMP of monocrystalline silicon can be performed with the proposed UEV-CMP technique.

  18. Damascene Array Structure of Phase Change Memory Fabricated with Chemical Mechanical Polishing Method

    Institute of Scientific and Technical Information of China (English)

    LIU Qi-Bin; SONG Zhi-Tang; ZHANG Kai-Liang; WANG Liang-Yong; FENG Song-Lin; CHEN Bomy

    2006-01-01

    @@ A damascene structure of phase change memory (PCM) is fabricated successfully with the chemical mechanical polishing (CMP) method, and the CMP of Ge2Sb2Te5 (GST) and Ti films is investigated. The polished surface of wafer is analysed by scanning electron microscopy (SEM) and an energy dispersive spectrometer (EDS). The measurements show that the damascene device structure of phase change memory is achieved by the CMP process.After the top electrode is deposited, dc sweeping test on PCM reveals that the phase change can be observed.The threshold current of array cells varies between 0.90mA and 1.15mA.

  19. Tribochemical interaction between nanoparticles and surfaces of selective layer during chemical mechanical polishing

    Energy Technology Data Exchange (ETDEWEB)

    Ilie, Filip, E-mail: filip@meca.omtr.pub.ro [Polytechnic University of Bucharest, Department of Machine Elements and Tribology (Romania)

    2013-11-15

    Nanoparticles have been widely used in polish slurries such as those in the chemical mechanical polishing (CMP) process. For understanding the mechanisms of CMP, an atomic force microscope (AFM) is used to characterize polished surfaces of selective layers, after a set of polishing experiments. To optimize the CMP polishing process, one needs to get information on the interaction between the nano-abrasive slurry nanoparticles and the surface of selective layer being polished. The slurry used in CMP process of the solid surfaces is slurry with large nanoparticle size colloidal silica sol nano-abrasives. Silica sol nano-abrasives with large nanoparticle are prepared and characterized by transmission electron microscopy, particles colloidal size, and Zeta potential in this paper. The movement of nanoparticles in liquid and the interaction between nanoparticles and solid surfaces coating with selective layer are very important to obtain an atomic alloy smooth surface in the CMP process. We investigate the nanoparticle adhesion and removal processes during CMP and post-CMP cleaning. The mechanical interaction between nanoparticles and the wafer surface was studied using a microcontact wear model. This model considers the nanoparticle effects between the polishing interfaces during load balancing. Experimental results on polishing and cleaning are compared with numerical analysis. This paper suggests that during post-CMP cleaning, a combined effort in chemical and mechanical interaction (tribochemical interactions) would be effective in removal of small nanoparticles during cleaning. For large nanoparticles, more mechanical forces would be more effective. CMP results show that the removal rate has been improved to 367 nm/min and root mean square (RMS) of roughness has been reduced from 4.4 to 0.80 nm. Also, the results show that the silica sol nano-abrasives about 100 nm are of higher stability (Zeta potential is −65 mV) and narrow distribution of nanoparticle

  20. Surface characteristics of ruthenium in periodate-based slurry during chemical mechanical polishing

    Energy Technology Data Exchange (ETDEWEB)

    Cheng, Jie; Wang, Tongqing; Jiang, Liang; Lu, Xinchun, E-mail: xclu@tsinghua.edu.cn

    2015-10-01

    Highlights: • The Ru surface chemical and mechanical property varies with KIO{sub 4} slurry pH. • In alkaline slurry, the corrosion proceeds uniformly like a direct dissolution. • In neutral and acidic slurries, Ru exhibits passivation behavior. • MRR is highest in neutral slurry due to inhomogeneous RuO{sub 2}·2H{sub 2}O/RuO{sub 3} passivation. • Weak alkaline slurry is preferred to get good MRR and avoid toxic RuO{sub 4} formation. - Abstract: When the feature size of integrated circuit continues to shrink below 14 nm, ruthenium (Ru) has become one of the most promising candidates for the application of novel barrier layer. To reveal the material removal mechanism of Ru during chemical mechanical polishing (CMP), surface characteristics of Ru in KIO{sub 4}-based slurry were investigated. The corrosion behavior of ruthenium was measured by the surface chemistry and morphology analysis. Then the mechanical properties of the passivated/corroded surface were evaluated by AES and tribocorrosion experiments. CMP experiments were carried out to make clear the effects of surface property during polishing. It was found that the Ru surface chemistry and mechanical properties vary obviously as a function of slurry pH. In neutral slurries, the Ru surface is covered with RuO{sub 2}·2H{sub 2}O/RuO{sub 3} inhomogeneous passivation films, with the highest material removal rate obtained during the CMP process. It could be concluded that the material removal mechanism largely depends on the slurry pH values. In near neutral slurries, Ru is passivated with thick and heterogeneous oxides film, which proves the easiest to be mechanically removed during polishing. The weak alkaline slurry is preferred in order to achieve desirable polishing rate as well as avoid the formation of toxic RuO{sub 4}.

  1. Role of crystal orientation on chemical mechanical polishing of single crystal copper

    Science.gov (United States)

    Zhu, Aibin; He, Dayong; Luo, Wencheng; Liu, Yangyang

    2016-11-01

    The material removal mechanism of single crystal copper in chemical mechanical polishing (CMP) has not been intensively investigated. And the role of crystal orientation in CMP of single crystal cooper is not quite clear yet. Quasi-continuum method was adopted in this paper to simulate the process of nano-particles grinding on single crystal copper in CMP process. Three different crystal orientations, i.e. x[100]y[001], x[001]y[110] and x[-211]y[111], were chosen for analysis. The atom displacement diagrams, stress distribution diagrams and load-displacement curves were obtained. After analyzing the deformation mechanism, residual stress of the work piece material and cutting force, results showed that, the crystal orientation of work piece has great influence on the deformation characteristics and surface quality of work piece during polishing. In the A(001)[100] orientation, the residual stress distribution after polishing is deeper, and the stress is larger than that in the B(110)[001] and C(111)[-211] orientations. And the average tangential cutting force in the A(001)[100] orientation is much larger than those in the other two crystal orientation. This research is helpful to revealing the material removal mechanism of CMP process.

  2. Inducing Changes in Surface Topography of Copper Thin Films: Implications for Chemical Mechanical Polishing

    Science.gov (United States)

    Smith, C. L.; Mitchell, E. J. R.; Koeck, D. C.; Galloway, H. C.

    2000-10-01

    We have investigated the effects of pH and corrosion inhibitors on the surface of Cu films when exposed and polished in H_2O2 based slurries. Acetic Acid was used to buffer H_2O2 into the acidic range necessary to keep the corrosion inhibitor, benzotriazole (BTA) in solution. Surface characteristics were examined using atomic force microscopy and profilometry. Some conditions cause dramatic changes in the surface topography of the Cu films. The original small "grains" that give the film a uniform roughness, disappear and leave large crystalline appearing structures with terrace widths of up to 600 Åand heights of 200-1000 ÅWe believe these changes have strong implications for Chemical Mechanical Polishing processes used to manufacture integrated circuits and will discuss how these changes in surface topography may be occurring.

  3. Chemical Mechanical Polishing of Glass Substrate with α-Alumina-g-Polystyrene Sulfonic Acid Composite Abrasive

    Institute of Scientific and Technical Information of China (English)

    LEI Hong; BU Naijing; ZHANG Zefang; CHEN Ruling

    2010-01-01

    Abrasive is the one of key influencing factors during chemical mechanical polishing(CMP) process. Currently, α-Alumina (α-Al2O3) particle, as a kind of abrasive, has been widely used in CMP slurries, but their high hardness and poor dispersion stability often lead to more surface defects. After being polished with composite particles, the surface defects of work pieces decrease obviously. So the composite particles as abrasives in slurry have been paid more attention. In order to reduce defect caused by pure α-Al2O3 abrasive, α-alumina-g-polystyrene sulfonic acid (α-Al2O3-g-PSS) composite abrasive was prepared by surface graft polymerization. The composition, structure and morphology of the product were characterized by Fourier transform infrared spectroscopy(FTIR), X-ray photoelectron spectroscopy(XPS), time-of-flight secondary ion mass spectroscopy(TOF-SIMS), and scanning electron microscopy(SEM), respectively. The results show that polystyrene sulfonic acid grafts onto α-Al2O3, and has well dispersibility. Then, the chemical mechanical polishing performances of the composite abrasive on glass substrate were investigated with a SPEEDFAM-16B-4M CMP machine. Atomic force microscopy(AFM) images indicate that the average roughness of the polished glass substrate surface can be decreased from 0.835 nm for pure α-Al2O3 abrasive to 0.583 nm for prepared α-Al2O3-g-PSS core-shell abrasive. The research provides a new and effect way to improve the surface qualities during CMP.

  4. Effects of catalyst concentration and ultraviolet intensity on chemical mechanical polishing of GaN

    Science.gov (United States)

    Wang, Jie; Wang, Tongqing; Pan, Guoshun; Lu, Xinchun

    2016-08-01

    Effects of catalyst concentration and ultraviolet intensity on chemical mechanical polishing (CMP) of GaN were deeply investigated in this paper. Working as an ideal homogeneous substrate material in LED industry, GaN ought to be equipped with a smooth and flat surface. Taking the strong chemical stability of GaN into account, photocatalytic oxidation technology was adopted in GaN CMP process to realize efficient removal. It was found that, because of the improved reaction rate of photocatalytic oxidation, GaN material removal rate (MRR) increases by a certain extent with catalyst concentration increasing. Cross single line analysis on the surface after polishing by Phase Shift MicroXAM-3D was carried out to prove the better removal effect with higher catalyst concentration. Ultraviolet intensity field in H2O2-SiO2-based polishing system was established and simulated, revealing the variation trend of ultraviolet intensity around the outlet of the slurry. It could be concluded that, owing to the higher planarization efficiency and lower energy damage, the UV lamp of 125 W is the most appropriate lamp in this system. Based on the analysis, defects removal model of this work was proposed to describe the effects of higher catalyst concentration and higher power of UV lamp.

  5. Chemical mechanical polishing of steel substrate using colloidal silica-based slurries

    Science.gov (United States)

    Jiang, Liang; He, Yongyong; Luo, Jianbin

    2015-03-01

    AISI 52100 steel has been widely used in the mechanical industry due to its excellent mechanical properties and high availability. In some cases, an ultra-smooth surface of AISI 52100 steel is needed and is even indispensable for the satisfactory performance of devices. In this paper, chemical mechanical polishing technique was employed to prepare the ultra-smooth surface of AISI 52100 steel. Colloidal silica was used as the abrasive. The effects of pH, complexing agent such as glycine, H2O2 and benzotriazole (BTA) on the polishing performance were studied. It is revealed that, with the increase of pH, the static etching rate (SER) and the material removal rate (MRR) are both gradually reduced, and the post-CMP surface roughness Ra decreases. This is attributed to the fact that compact and passive iron oxides, especially Fe(III) oxides, gradually form on the top surface. At pH 4.00, in the presence of glycine, and with the increase of the H2O2 concentration, the SER is further suppressed, and the surface roughness Ra gradually decreases; the MRR initially dramatically increases due to the fact that, with the addition of small amount of H2O2, the porous iron oxide layer with relatively low mechanical strength can be rapidly formed on the surface. Moreover, glycine intensifies the chemical dissolution by chelating iron ions, especially Fe(II) ions, and thereby the mechanical strength of the oxide layer further weakens. Then, after reaching the peak value, the MRR gradually decreases when the H2O2 concentration further increases since the compactness of the oxide layer gradually increases. With the increase of the BTA concentration, the MRR is gradually suppressed and the surface roughness Ra decreases due to the formation of Fe-BTA passivating film on the top surface. Finally, a two-step polishing process was developed. The polishing results show that, within 20 min, a rough surface of AISI 52100 steel with the Ra value of 188 nm can be polished into an ultra

  6. Study of Cu-Inhibitor State for Post-Chemical Mechanical Polishing Cleaning

    Science.gov (United States)

    Harada, Ken; Ito, Atsushi; Kawase, Yasuhiro; Suzuki, Toshiyuki; Hara, Makoto; Sakae, Rina; Kimura, Chiharu; Aoki, Hidemitsu

    2011-05-01

    In order to reduce corrosion on the Cu surface in post-chemical mechanical polishing (CMP) cleaning, controlling the state of inhibitor layers is indispensable. In this study, to investigate the behavior of inhibitor layers in the cleaning process, Cu-benzotriazole (BTA) layers on CuOX were analyzed by electrochemical measurements and surface analysis. Electrochemical measurements revealed that Cu(I)-BTA can prevent corrosion more efficiently than Cu(II)-BTA, and surface analysis revealed that the Cu(I)-BTA layer is thin, whereas the Cu(II)-BTA layer is bulky. The Cu(I)-BTA layer is effective in preventing corrosion of the Cu surface.

  7. Investigation of slurry systems in metal and dielectric chemical mechanical polishing

    Science.gov (United States)

    Lu, Zhenyu

    The properties of slurries play a significant role in chemical mechanical polishing (CMP) of metal and dielectric films in semiconductor device manufacturing. This study investigates the effects of the size, shape, and hardness of uniform abrasive particles of simple and composite natures on the polishing of copper, tantalum, and thermal oxide films in the presence of different chemical reagents. It was shown that the total surface area of the solids in the slurry controlled the material removal rate by pure silica for both Cu and Ta, while the surface quality of the polished films was better when using higher silica contents. Ceria particles are the choice abrasives in polishing of oxide surfaces. Since it is difficult to prepare in quantities uniform ceria particles of various shapes, the latter were prepared by using monodispersed cubic and ellipsoidal hematite (Fe2O3) particles and spherical silica, and coating them with nanosized ceria. The polishing data were then obtained using slurries of all these particles and the results were compared with slurries containing only nanosized ceria. At the same pH and the same solid content, the removal rates of these slurries followed the contact area model. Furthermore, slurries containing mixtures of particles performed more efficiently than those of individual particles. Interactions of abrasive particles with surface films to be polished are also very important in CMP. In this study, the packed column technique was employed to investigate the physical and chemical reactions at the particle/film interfaces under conditions that simulate CMP processes. Well-defined dispersions of uniform particles, including spherical silica, calcined alumina, and silica cores coated with nanosized ceria particles were used to evaluate particle adhesion on copper and glass beads. It was shown that pH and the slurry flow rate had significant effects on particle deposition and detachment. The attachment results of silica particles on

  8. TWO STEPS CHEMICAL-MECHANICAL POLISHING OF RIGID DISK SUBSTRATE TO GET ATOM-SCALE PLANARIZATION SURFACE

    Institute of Scientific and Technical Information of China (English)

    LEI Hong; LUO Jianbin; LU Xinchun

    2006-01-01

    In order to get atomic smooth rigid disk substrate surface, ultra-fined alumina slurry and nanometer silica slurry are prepared, and two steps chemical-mechanical polishing (CMP) of rigid disk substrate in the two slurries are studied. The results show that, during the first step CMP in the alumina slurry, a high material removal rate is reached, and the average roughness (Ra) and the average waviness (Wa) of the polished surfaces can be decreased from previous 1.4 nm and 1.6 nm to about 0.6 nm and 0.7 nm, respectively. By using the nanometer silica slurry and optimized polishing process parameters in the second step CMP, the Ra and the Wa of the polished surfaces can be further reduced to 0.038 nm and 0.06 nm, respectively. Atom force microscopy (AFM) analysis shows that the final polished surfaces are ultra-smooth without micro-defects.

  9. Effect of Nano-sized CeO2 Abrasives on Chemical Mechanical Polishing of Silicon Wafer

    Institute of Scientific and Technical Information of China (English)

    ZHANG Bao-sen; CHEN Yang

    2006-01-01

    The conception of the soft layer during chemical mechanical polishing(CMP) was proposed for the first time. The soft layer was a reaction layer formed on the silicon surface; it was softer than the silicon substrate and its thickness was about several nanometers. The existence of the soft layer could increase the material volume removed by one particle and increase the material removal rate during CMP. At the same time, the soft layer could decrease the cutting depth of the abrasive particle so as to realize ductile grinding, and it is useful to decrease the roughness of the polished surface and to improve the polishing quality.

  10. Evaluation of Cu Ion Concentration Effects on Cu Etching Rate in Chemical-Mechanical Polishing Slurry

    Science.gov (United States)

    Nishizawa, Hideaki; Sugiura, Osamu; Matsumura, Yoshiyuki; Kinoshita, Masaharu

    2007-04-01

    The effects of Cu ion concentration of the different solutions on Cu etching rate were investigated. From the dipping experiment of Cu substrates in different solutions of malic acid, hydrogen peroxide (H2O2), benzotriazole (BTA), and Cu ions, it was revealed that Cu etching rate is increased if the concentration of Cu(II) ions added in the solution is high. This is considered to be caused by the effect of Cu(II) ions on H2O2 molecules. In the solution of pH 7, the Cu etching rate increased markedly between 1.7× 10-4 and 3.4× 10-4 M Cu(II) ion concentrations. The maximum increase in the etching rate was from 990 to 2200 nm/min at a H2O2 concentration of 2 wt %. In the solution of pH 3, a marked change in the etching rate was not observed. Our results show that the concentration of Cu ions on the polishing pad in chemical-mechanical polishing (CMP) process is very important.

  11. Nanotopography Impact in Shallow Trench Isolation Chemical Mechanical Polishing-Dependence on Slurry Characteristics

    Institute of Scientific and Technical Information of China (English)

    Jea-Gun Park; Takeo Katoh; Ungyu Paik

    2004-01-01

    The nanotopography of the surface of silicon wafers has become an important issue in ULSI device manufacturing since it affects the post-chemical mechanical polishing (post-CMP) uniformity of the thickness deviation of dielectric films. In this study, the nanotopography impact was investigated in terms of its dependence on the characteristics of ceriabased slurries, such as the abrasive size, the grain size of the polycrystalline abrasive and the surfactant added to the slurry. It was found that the magnitude of the post-CMP oxide thickness deviation due to nanotopography increased with the surfactant concentration in the case of smaller abrasives but was almost independent of the concentration in the case of larger abrasives. The grain size of the polycrystalline abrasive did not affect the nanotopography impact.

  12. Reactive Ion Etching as Cleaning Method Post Chemical Mechanical Polishing for Phase Change Memory Device

    Institute of Scientific and Technical Information of China (English)

    ZHONG Min; SONG Zhi-Tang; LIU Bo; FENG Song-Lin; CHEN Bomy

    2008-01-01

    In order to improve nano-scale phase change memory performance,a super-clean interface should be obtained after chemical mechanical polishing (CMP) of Ge2Sb2Te5 phase change films.We use reactive ion etching (RIE) as the cleaning method.The cleaning effect is analysed by scanning electron microscopy and an energy dispersive spectrometer.The results show that particle residue on the surface has been removed.Meanwhile,Ge2 Sb2 Te5 material stoichiometric content ratios are unchanged.After the top electrode is deposited,currentvoltage characteristics test demonstrates that the set threshold voltage is reduced from 13 V to 2.7V and the threshold current from 0.1 mA to 0.025 mA.Furthermore,we analyse the RIE cleaning principle and compare it with the ultrasonic method.

  13. Classical molecular dynamics and ab initio simulations of chemical-mechanical polishing of amorphous silica

    Science.gov (United States)

    Chagarov, Evgueni Anatolievich

    Chemical-mechanical polishing (CMP) is a widely accepted process in the semiconductor industry. Despite intense theoretical and experimental research on CMP, there is a serious lack of fundamental understanding of the physical-chemical processes of polishing. The present work is intended to investigate these fundamental processes on an atomistic level. To model CMP on the atomic scale, a model of the amorphous silica is prepared by applying Design of Experiments (DOE) techniques to systematically investigate molecular dynamics preparation. These simulations yield high-quality models of amorphous silica, which are in excellent agreement with experimental results and are defect-free. Molecular dynamics simulations are performed to investigate the mechanical deformation during CMP of silica for different geometries and relative velocities. The simulations clarify asperity shape evolution during the process of shear and reveal temperature distributions as a function of time. It is found that the ratio of radii of a particle and asperity strongly affects the amount of the material removed whereas the relative velocity has a weaker affect on it. During shear, a significant local temperature increase occurs. This temperature increase lasts for a short time (picoseconds), but it can have a major impact on the amount of material removed. It is found that there could be significant deposition of the material from the particle to the slab, which can fill surface trenches and thereby make the surface smoother. An analytic model is developed for describing the amount of material removed as a function of asperity and particle radii and relative velocity. Density-functional calculations of different surfaces of two silica polymorphs, alpha-quartz and beta-cristobalite, are performed. The surface energies are calculated as a function of oxygen partial pressure for several different surface reconstructions and terminations. The case of hydrogen passivation is investigated to

  14. Adsorption treatment of oxide chemical mechanical polishing wastewater from a semiconductor manufacturing plant by electrocoagulation

    Energy Technology Data Exchange (ETDEWEB)

    Chou, Wei-Lung, E-mail: wlchou@sunrise.hk.edu.tw [Department of Safety, Health and Environmental Engineering, Hungkuang University, No. 34, Chung-Chie Road, Sha-Lu, Taichung 433, Taiwan (China); Wang, Chih-Ta [Department of Safety Health and Environmental Engineering, Chung Hwa University of Medical Technology, Tainan Hsien 717, Taiwan (China); Chang, Wen-Chun; Chang, Shih-Yu [Department of Safety, Health and Environmental Engineering, Hungkuang University, No. 34, Chung-Chie Road, Sha-Lu, Taichung 433, Taiwan (China)

    2010-08-15

    In this study, metal hydroxides generated during electrocoagulation (EC) were used to remove the chemical oxygen demand (COD) of oxide chemical mechanical polishing (oxide-CMP) wastewater from a semiconductor manufacturing plant by EC. Adsorption studies were conducted in a batch system for various current densities and temperatures. The COD concentration in the oxide-CMP wastewater was effectively removed and decreased by more than 90%, resulting in a final wastewater COD concentration that was below the Taiwan discharge standard (100 mg L{sup -1}). Since the processed wastewater quality exceeded the direct discharge standard, the effluent could be considered for reuse. The adsorption kinetic studies showed that the EC process was best described using the pseudo-second-order kinetic model at the various current densities and temperatures. The experimental data were also tested against different adsorption isotherm models to describe the EC process. The Freundlich adsorption isotherm model predictions matched satisfactorily with the experimental observations. Thermodynamic parameters, including the Gibbs free energy, enthalpy, and entropy, indicated that the COD adsorption of oxide-CMP wastewater on metal hydroxides was feasible, spontaneous and endothermic in the temperature range of 288-318 K.

  15. The way to zeros: The future of semiconductor device and chemical mechanical polishing technologies

    Science.gov (United States)

    Tsujimura, Manabu

    2016-06-01

    For the last 60 years, the development of cutting-edge semiconductor devices has strongly emphasized scaling; the effort to scale down current CMOS devices may well achieve the target of 5 nm nodes by 2020. Planarization by chemical mechanical polishing (CMP), is one technology essential for supporting scaling. This paper summarizes the history of CMP transitions in the planarization process as well as the changing degree of planarity required, and, finally, introduces innovative technologies to meet the requirements. The use of CMP was triggered by the replacement of local oxidation of silicon (LOCOS) as the element isolation technology by shallow trench isolation (STI) in the 1980s. Then, CMP’s use expanded to improving embedability of aluminum wiring, tungsten (W) contacts, Cu wiring, and, more recently, to its adoption in high-k metal gate (HKMG) and FinFET (FF) processes. Initially, the required degree of planarity was 50 nm, but now 0 nm is required. Further, zero defects on a post-CMP wafer is now the goal, and it is possible that zero psi CMP loading pressure will be required going forward. Soon, it seems, everything will have to be “zero” and perfect. Although the process is also chemical in nature, the CMP process is actually mechanical with a load added using slurry particles several tens of nm in diameter. Zero load in the loading process, zero nm planarity with no trace of processing, and zero residual foreign material, including the very slurry particles used in the process, are all required. This article will provide an overview of how to achieve these new requirements and what technologies should be employed.

  16. Surface modification of ceria nanoparticles and their chemical mechanical polishing behavior on glass substrate

    Energy Technology Data Exchange (ETDEWEB)

    Zhang Zefang, E-mail: zfzhang@mail.sim.ac.cn [State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China); Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506 (China); Graduate School of the Chinese Academy of Sciences, Beijing 100049 (China); Yu Lei [State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China); Graduate School of the Chinese Academy of Sciences, Beijing 100049 (China); Liu Weili, E-mail: rabbitlwl@mail.sim.ac.cn [State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China); Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506 (China); Song Zhitang [State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China); Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506 (China)

    2010-04-01

    To improve their chemical mechanical polishing (CMP) performance, ceria nanoparticles were surface modified with {gamma}-aminopropyltriethoxysilane (APS) through silanization reaction with their surface hydroxyl group. The compositions, structures and dispersibility of the modified ceria particles were characterized by Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), field-emission scanning electron microscopy (FE-SEM), energy dispersive spectroscopy (EDS), laser particle size analyzer, zeta potential measurement and stability test, respectively. The results indicated that APS had been successfully grafted onto the surface of ceria nanoparticles, which led to the modified ceria nanoparticles with better dispersibility and stability than unmodified ceria particles in aqueous fluids. Then, CMP performance of the modified ceria nanoparticles on glass substrate was investigated. Experimental results showed that the modified ceria particles exhibited lower material removal rate (MRR) but much better surface quality than unmodified ceria particles, which may be explained by the hardness reduction of ceria particles, the enhancement of lubrication of the particles and substrate surfaces, and the elimination of the agglomeration among the ceria particles.

  17. KDP Aqueous Solution-in-Oil Microemulsion for Ultra-Precision Chemical-Mechanical Polishing of KDP Crystal

    Directory of Open Access Journals (Sweden)

    Hui Dong

    2017-03-01

    Full Text Available A novel functional KH2PO4 (KDP aqueous solution-in-oil (KDP aq/O microemulsion system for KDP crystal ultra-precision chemical-mechanical polishing (CMP was prepared. The system, which consisted of decanol, Triton X-100, and KH2PO4 aqueous solution, was available at room temperature. The functional KDP aq/O microemulsion system was systematically studied and applied as polishing solution to KDP CMP technology. In this study, a controlled deliquescent mechanism was proposed for KDP polishing with the KDP aq/O microemulsion. KDP aqueous solution, the chemical etchant in the polishing process, was caged into the micelles in the microemulsion, leading to a limitation of the reaction between the KDP crystal and KDP aqueous solution only if the microemulsion was deformed under the effect of the external force. Based on the interface reaction dynamics, KDP aqueous solutions with different concentrations (cKDP were applied to replace water in the traditional water-in-oil (W/O microemulsion. The practicability of the controlled deliquescent mechanism was proved by the decreasing material removal rate (MRR with the increasing of the cKDP. As a result, the corrosion pits on the KDP surface were avoided to some degree. Moreover, the roughnesses of KDP with KDP aq/O microemulsion (cKDP was changed from 10 mM to 100 mM as polishing solutions were smaller than that with the W/O microemulsion. The smallest surface root-mean-square roughness of 1.5 nm was obtained at a 30 mmol/L KDP aq solution, because of the most appropriate deliquescent rate and MRR.

  18. Ultrasmooth gold surfaces prepared by chemical mechanical polishing for applications in nanoscience.

    Science.gov (United States)

    Miller, Michael S; Ferrato, Michael-Anthony; Niec, Adrian; Biesinger, Mark C; Carmichael, Tricia Breen

    2014-12-02

    For over 20 years, template stripping has been the best method for preparing ultrasmooth metal surfaces for studies of nanostructures. However, the organic adhesives used in the template stripping method are incompatible with many solvents, limiting the conditions that may subsequently be used to prepare samples; in addition, the film areas that can be reliably prepared are typically limited to ∼1 cm(2). In this article, we present chemical-mechanical polishing (CMP) as an adhesive-free, scalable method of preparing ultrasmooth gold surfaces. In this process, a gold film is first deposited by e-beam evaporation onto a 76-mm-diameter silicon wafer. The CMP process removes ∼4 nm of gold from the tops of the grains comprising the gold film to produce an ultrasmooth gold surface supported on the silicon wafer. We measured root-mean-square (RMS) roughness values using atomic force microscopy of 12 randomly sampled 1 μm × 1 μm areas on the surface of the wafer and repeated the process on 5 different CMP wafers. The average RMS roughness was 3.8 ± 0.5 Å, which is comparable to measured values for template-stripped gold (3.7 ± 0.5 Å). We also compared the use of CMP and template-stripped gold as bottom electrical contacts in molecular electronic junctions formed from n-alkanethiolate self-assembled monolayers as a sensitive test bed to detect differences in the topography of the gold surfaces. We demonstrate that these substrates produce statistically indistinguishable values for the tunneling decay coefficient β, which is highly sensitive to the gold surface topography.

  19. Study on planarization machining of sapphire wafer with soft-hard mixed abrasive through mechanical chemical polishing

    Science.gov (United States)

    Xu, Yongchao; Lu, Jing; Xu, Xipeng

    2016-12-01

    This study investigated the material removal mechanism of sapphire wafer with soft-hard mixed abrasives through mechanical chemical polishing (MCP). The polishing film, which contains diamond as hard abrasives and high reactivity silica as soft abrasives, is prepared through sol-gel technology. Silica abrasives with regular spherical shape and high reactivity are prepared through hydrolysis-precipitation. Diamond grits with three different particle sizes are used as abrasives. Results show that the rate of material removal of mixed abrasives during MCP is more than 52.6% of that of single hard abrasives and the decrease in surface roughness is more than 21.6% of that of single hard abrasives. These results demonstrate that the ideal planarization of sapphire wafer with high removal rate and good surface quality can be achieved when the effect of mechanical removal of hard abrasives and the chemical corrosion effect of soft abrasives are in dynamic equilibrium. A model that describes the material removal mechanism of sapphire with mixed abrasives during MCP is proposed. The results of thermodynamic calculation and polishing residue analysis are used to demonstrate the rationality of the model.

  20. Gallic Acid as a Complexing Agent for Copper Chemical Mechanical Polishing Slurries at Neutral pH

    Science.gov (United States)

    Kim, Yung Jun; Kang, Min Cheol; Kwon, Oh Joong; Kim, Jae Jeong

    2011-05-01

    Gallic acid was investigated as a new complexing agent for copper (Cu) chemical mechanical polishing slurries at neutral pH. Addition of 0.03 M gallic acid and 1.12 M H2O2 at pH 7 resulted in a Cu removal rate of 560.73±17.49 nm/min, and the ratio of the Cu removal rate to the Cu dissolution rate was 14.8. Addition of gallic acid improved the slurry performance compared to glycine addition. X-ray photoelectron spectroscopy analysis and contact angle measurements showed that addition of gallic acid enhanced the Cu polishing behavior by suppressing the formation of surface Cu oxide.

  1. Synthesis and Characterization of SiO2 Nanoparticles and Their Efficacy in Chemical Mechanical Polishing Steel Substrate

    Directory of Open Access Journals (Sweden)

    M. J. Kao

    2014-01-01

    Full Text Available Chemical mechanical polishing (CMP technology is extensively used in the global planarization of highly value-added and large components in the aerospace industry. A nanopowder of SiO2 was prepared by the sol-gel method and was compounded into polishing slurry for the CMP of steel substrate. The size of the SiO2 abrasives was controlled by varying the sol-gel reaction conditions. The polishing efficacy of nano-SiO2 was studied, and the CMP mechanism with nanosized abrasives was further investigated. The proposed methods can produce SiO2 abrasives whose size can be controlled by varying the sol-gel reaction conditions. The size of the SiO2 abrasives was controlled in the range from 58 to 684 nm. The roughness of the steel substrate strongly depends on the size of the abrasive, and the surface roughness decreases as the abrasive size declines. A super-smooth surface with a roughness of 8.4 nm is obtained with nanosized SiO2. Ideal CMP slurry can be used to produce material surfaces with low roughness, excellent global planarization, high selectivity, an excellent finish, and a low-defected rate.

  2. Chemical mechanical polishing of Indium phosphide, Gallium arsenide and Indium gallium arsenide films and related environment and safety aspects

    Science.gov (United States)

    Matovu, John Bogere

    As scaling continues with advanced technology nodes in the microelectronic industry to enhance device performance, the performance limits of the conventional substrate materials such as silicon as a channel material in the front-end-of-the-line of the complementary metal oxide semiconductor (CMOS) need to be surmounted. These challenges have invigorated research into new materials such as III-V materials consisting of InP, GaAs, InGaAs for n-channel CMOS and Ge for p-channels CMOS to enhance device performance. These III-V materials have higher electron mobility that is required for the n-channel while Ge has high hole mobility that is required for the p-channel. Integration of these materials in future devices requires chemical mechanical polishing (CMP) to achieve a smooth and planar surface to enable further processing. The CMP process of these materials has been associated with environment, health and safety (EH&S) issues due to the presence of P and As that can lead to the formation of toxic gaseous hydrides. The safe handling of As contaminated consumables and post-CMP slurry waste is essential. In this work, the chemical mechanical polishing of InP, GaAs and InGaAs films and the associated environment, health and safety (EH&S) issues are discussed. InP removal rates (RRs) and phosphine generation during the CMP of blanket InP films in hydrogen peroxide-based silica particle dispersions in the presence and absence of three different multifunctional chelating carboxylic acids, namely oxalic acid, tartaric acid, and citric acid are reported. The presence of these acids in the polishing slurry resulted in good InP removal rates (about 400 nm min-1) and very low phosphine generation (isolation structures was planarized and scratches, slurry particles and smearing of InP were absent. Additionally, wafers polished at pH 6 showed very low dishing values of about 12-15 nm, determined by cross sectional SEM. During the polishing of blanket GaAs, GaAs RRs were

  3. XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

    Energy Technology Data Exchange (ETDEWEB)

    Zhou, Yan [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Pan, Guoshun, E-mail: pangs@tsinghua.edu.cn [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Shi, Xiaolei; Xu, Li; Zou, Chunli; Gong, Hua; Luo, Guihai [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China)

    2014-10-15

    Highlights: • CMP removal mechanism of Si-face SiC wafer is investigated through XPS analysis. • UV–vis spectroscopy is used to study CMP removal mechanisms. • CMP removal model of Si-face SiC wafer is proposed. • The variations of atomic step morphology on ultra-smooth surface via AFM is studied. - Abstract: Chemical mechanical polishing (CMP) removal mechanisms of on-axis Si-face SiC wafer have been investigated through X-ray photoelectron spectroscopy (XPS), UV–visible (UV–vis) spectroscopy and atomic force microscopy (AFM). XPS results indicate that silicon oxide is formed on Si-face surface polished by the slurry including oxidant H{sub 2}O{sub 2}, but not that after immersing in H{sub 2}O{sub 2} solution. UV–vis spectroscopy curves prove that • OH hydroxyl radical could be generated only under CMP polishing by the slurry including H{sub 2}O{sub 2} and abrasive, so as to promote oxidation of Si-face to realize the effective removal; meanwhile, alkali KOH during CMP could induce the production of more radicals to improve the removal. On the other side, ultra-smooth polished surface with atomic step structure morphology and extremely low Ra of about 0.06 nm (through AFM) is obtained using the developed slurry with silica nanoparticle abrasive. Through investigating the variations of the atomic step morphology on the surface polished by different slurries, it's reveals that CMP removal mechanism involves a simultaneous process of surface chemical reaction and nanoparticle atomic scale abrasion.

  4. A nano-scale mirror-like surface of Ti-6Al-4V attained by chemical mechanical polishing

    Science.gov (United States)

    Chenliang, Liang; Weili, Liu; Shasha, Li; Hui, Kong; Zefang, Zhang; Zhitang, Song

    2016-05-01

    Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electro-mechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibility. As the application of Ti moves to the micro or nano scale, however, traditional methods of planarization have shown their short slabs. Thus, we introduce the method of chemical mechanical polishing (CMP) to provide a new way for the nano-scale planarization method of Ti alloys. We obtain a mirror-like surface, whose flatness is of nano-scale, via the CMP method. We test the basic mechanical behavior of Ti-6Al-4V (Ti64) in the CMP process, and optimize the composition of CMP slurry. Furthermore, the possible reactions that may take place in the CMP process have been studied by electrochemical methods combined with x-ray photoelectron spectroscopy (XPS). An equivalent circuit has been built to interpret the dynamic of oxidation. Finally, a model has been established to explain the synergy of chemical and mechanical effects in the CMP of Ti-6Al-4V. Project supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period of China (Grant No. 2009ZX02030-1), the National Natural Science Foundation of China (Grant No. 51205387), the Support by Science and Technology Commission of Shanghai City, China (Grant No. 11nm0500300), and the Science and Technology Commission of Shanghai City, China (Grant No. 14XD1425300).

  5. Characterization of wet pad surface in chemical mechanical polishing (CMP) process with full-field optical coherence tomography (FF-OCT).

    Science.gov (United States)

    Choi, Woo June; Jung, Sung Pyo; Shin, Jun Geun; Yang, Danning; Lee, Byeong Ha

    2011-07-04

    Chemical mechanical polishing (CMP) is a key process for global planarization of silicon wafers for semiconductors and AlTiC wafers for magnetic heads. Removal rate of wafer material is directly dependent on the surface roughness of a CMP pad, thus the structure of the pad surface has been evaluated with variable techniques. However, under in situ CMP process, the measurements have been severely limited due to the existence of polishing fluids including the slurry on the pad surface. In here, we newly introduce ultra-high resolution full-field optical coherence tomography (FF-OCT) to investigate the surface of wet pads. With FF-OCT, the wet pad surface could be quantitatively characterized in terms of the polishing pad lifetime, and also be three-dimensionally visualized. We found that reasonable polishing span could be evaluated from the surface roughness measurement and the groove depth measurement made by FF-OCT.

  6. Core/shell composites with polystyrene cores and meso-silica shells as abrasives for improved chemical mechanical polishing behavior

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Yang, E-mail: cy.jpu@126.com; Qin, Jiawei; Wang, Yayun; Li, Zefeng [Changzhou University, School of Material Science and Engineering (China)

    2015-09-15

    The core/shell-structured organic/inorganic composite abrasive has an important potential application in damage-free chemical mechanical polishing (CMP) due to its non-rigid mechanical property. In this work, the PS/{sub M}SiO{sub 2} composites, containing polystyrene (PS) sphere (211 ± 4 nm) cores and mesoporous silica shells (31 ± 3 nm in thickness) were synthesized through directed surface sol–gel process of tetraethylorthosilicate on the polymer cores in the presence of the cetyltrimethylammonium bromide surfactant. For comparison, the conventional core/shell PS/{sub N}SiO{sub 2} composites with non-porous silica shells were also prepared via a modified Stöber procedure that involved the hydrolysis of TEOS under acidic condition. The physical properties of the samples were examined by small-angle X-ray diffraction, fourier transform infrared spectroscopy, thermogravimetric analysis, transmission electron microscopy, field emission scanning electron microscopy, and nitrogen adsorption–desorption. As novel abrasives, the core/shell-structured PS/{sub M}SiO{sub 2} composites were introduced into the CMP process for silicon oxide films. The oxide-CMP performance among conventional solid silica particles, PS/{sub N}SiO{sub 2} composites, and novel PS/{sub M}SiO{sub 2} composites was explored by atomic force microscopy. Polishing results indicated that the substrate revealed a comparable root-mean-square surface roughness (0.25 ± 0.03 and 0.22 ± 0.02 nm, respectively) after CMP with PS/{sub N}SiO{sub 2} and PS/{sub M}SiO{sub 2} abrasives under the same polishing conditions. However, the material removal rate of the PS/{sub M}SiO{sub 2} composites (123 ± 15 nm/min) was about three times larger than that of the PS/{sub N}SiO{sub 2} composites (47 ± 13 nm/min). The reduced surface roughness and improved removal rate might be due to the optimization of the physical and/or chemical environments in the local contacting region between abrasives

  7. Study on the Effects of Corrosion Inhibitor According to the Functional Groups for Cu Chemical Mechanical Polishing in Neutral Environment

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Sang Won; Kim, Jae Jeong [Institute of Chemical Process, Seoul National University, Seoul (Korea, Republic of)

    2015-08-15

    As the aluminum (Al) metallization process was replaced with copper (Cu), the damascene process was introduced, which required the planarization step to eliminate over-deposited Cu with Chemical Mechanical Polishing (CMP) process. In this study, the verification of the corrosion inhibitors, one of the Cu CMP slurry components, was conducted to find out the tendency regarding the carboxyl and amino functional group in neutral environment. Through the results of etch rate, removal rate, and chemical ability of corrosion inhibitors based on 1H-1,2,4-triazole as the base corrosion inhibitor, while the amine functional group presents high Cu etching ability, carboxyl functional group shows lower Cu etching ability than base-corrosion inhibitor which means that it increases passivation effect by making strong passivation layer. It implies that the corrosion inhibitor with amine functional group was proper to apply for 1st Cu CMP slurry owing to the high etch rate and with carboxyl functional group was favorable for the 2nd Cu CMP slurry due to the high Cu removal rate/dissolution rate ratio.

  8. Research on Abrasives in the Chemical Mechanical Polishing Process for Silicon Nitride Balls

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    Silicon nitride (Si 3N 4) has been the main material for balls in ceramic ball bearings, for its lower density, high strength, high hardness, fine thermal stability and anticorrosive, and is widely used in various fields, such as high speed and high temperature areojet engines, precision machine tools and chemical engineer machines. Silicon nitride ceramics is a kind of brittle and hard material that is difficult to machining. In the traditional finishing process of silicon nitride balls, balls are lapped...

  9. Corrosion electrochemical mechanism of chemical mechanical polishing of copper in K3Fe(CN)6 solution

    Institute of Scientific and Technical Information of China (English)

    何捍卫; 胡岳华; 黄可龙

    2002-01-01

    Polarization curves of copper were measured in NH3*H2O media containing K3Fe(CN)6. Components of passive film were analyzed by XPS. Relation of polishing rate with corrosion current density was investigated during CMP. Copper can be passivated in the slurry and main component of passive film is Cu4Fe(CN)6. Relation of polishing rate with corrosion current density is linear direct ratio and expressed as R=KJcorr during CMP. Coefficient K varies with different slurry systems but is constant under experimental conditions, which does not vary with NH3*H2O, K3Fe(CN)6, γ-Al2O3 concentrations, polishing pressures and rotative rate in a slurry system during CMP.

  10. Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing

    Energy Technology Data Exchange (ETDEWEB)

    Gong, Hua [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Pan, Guoshun, E-mail: pangs@tsinghua.edu.cn [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Zhou, Yan; Shi, Xiaolei; Zou, Chunli; Zhang, Suman [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China)

    2015-05-30

    Highlights: • Tiny-sized nanoparticles were introduced in GaN CMP to realize a good surface. • The relationship between surface characterization and abrasive size was conducted. • An atomic step-terrace structure was achieved on GaN surface after CMP. • Pt/C catalyst nanoparticles were used in GaN CMP to get a higher MRR. - Abstract: The relationship between the surface characterization after chemical mechanical polishing (CMP) and the size of the silica (SiO{sub 2}) abrasive used for CMP of gallium nitride (GaN) substrates was investigated in detail. Atomic force microscope was used for measuring the surface morphology, pit feature, pit depth distribution, and atomic step-terrace structure. With the decrease of SiO{sub 2} abrasive size, the pit depth reduced and the atomic step-terrace structure became more whole with smaller damage area, resulting in smaller roughness. For tiny-sized SiO{sub 2} abrasive, an almost complete atomic step-terrace structure with 0.0523 nm roughness was achieved. On the other hand, in order to acquire higher removal, Pt/C nanoparticle was employed as a catalyst in CMP slurry. The result indicates that when Pt/C catalyst content was reached to 1.0 ppm, material removal rate was increased by 47.69% compared to that by none of the catalyst, and besides, the pit depth reduced and the surface atomic step-terrace structure was not destroyed. The Pt/C nanoparticle is proved to be the promising catalyst to the surface preparation of super-hard and inert materials with high efficiency and good surface.

  11. Experimental Study of Chemical Mechanical Rough Polishing for Hard Disk Substrate%硬盘基板化学机械粗抛光的实验研究

    Institute of Scientific and Technical Information of China (English)

    刘利宾; 刘玉岭; 王胜利; 林娜娜; 杨立兵

    2011-01-01

    For rough polishing of NiP/Al substrate of hard disk, SiO2 colloid was adopted to polish the substrate of hard disk under different pressures, speed, pH values, abrasive concentration and activator concentration, the removal rate of hard disk substrate was measured and the surface analyses after chemical mechanical rough polishing were accomplished by atomic force microscope (AFM). Finally, five key polishing parameters were optimized. The results show that when the pressure is 0. 10 Mpa, the speed is 80 rad/min, the pH value is 11.2, the ratio of abrasive volume with the deionized water is 1:0. 5, and surfactant concentration is 9 mL/L, the removal rate of hard disk substrate is 27 mg/min, the surface roughness after polishing is 0.281 nm. After rough polishing of hard disk substrate, high removal rate and good surface roughness are obtained, and it will greatly reduce the time of fine polishing, which is beneficial to increase the polishing efficiency.%针对硬盘NiP/Al基板粗抛光,采用SiO2作为抛光磨料的碱性抛光液,在不同压力、转速、pH值、磨料浓度和活性剂体积浓度下,对硬盘基板粗抛光的去除速率和表面粗糙度的变化规律进行研究,用原子力显微镜观察抛光表面的微观形貌.最后对5个关键参数进行了优化.结果表明:当压力为0.10 MPa,转速为80 rad/min,pH值为11.2,磨料与去离子水体积比为1∶0.5,表面活性剂体积浓度为9 mL/L时,硬盘基板的去除速率为27 mg/min,粗抛后表面粗糙度为0.281 nm,获得了高的去除速率和较好的表面粗糙度,这样会大大降低精抛的时间,有利于抛光效率的提高.

  12. Synergetic effect of benzotriazole and non-ionic surfactant on copper chemical mechanical polishing in KIO{sub 4}-based slurries

    Energy Technology Data Exchange (ETDEWEB)

    Jiang, Liang [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Center for Advanced Materials Processing, Clarkson University, Potsdam, NY 13699 (United States); He, Yongyong [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Niu, Xiangyu; Li, Yuzhuo [Center for Advanced Materials Processing, Clarkson University, Potsdam, NY 13699 (United States); Luo, Jianbin, E-mail: luojb@tsinghua.edu.cn [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China)

    2014-05-02

    Ruthenium will be integrated into copper interconnects as a barrier layer in the near future. During the chemical mechanical polishing process of the ruthenium barrier layer, copper polishing performance with barrier slurries is crucial to microchips' final performance. This paper mainly studies the synergetic effect of benzotriazole (BTA) and non-ionic surfactant on copper polishing performance using KIO{sub 4}-based barrier slurries. The results show that, the copper removal rate (RR) and static etching rate increase with increasing concentration of KIO{sub 4} due to the increasing proportion of the Cu–periodate and Cu–iodate compounds like Cu(IO{sub 4}){sub 2} and Cu(IO{sub 3}){sub 2} of the passivating film on the copper surface; the added BTA can further enhance the copper RR instead of suppressing it probably due to the formation of incomplete Cu–BTA thin film. It is demonstrated that the combination of BTA and non-ionic surfactant exhibits excellent performance in suppressing the copper RR to about 200 Å/min, realizing satisfactory copper surface quality and achieving desirable material removal rate selectivity among copper, ruthenium and low-κ dielectrics. The synergetic passivation mechanism of BTA and non-ionic surfactant on the copper surface was investigated. It is proposed that in the presence of KIO{sub 4} as an oxidizer, the added BTA and non-ionic surfactant can form a porous passivating film on the copper surface which is mainly composed of the Cu–BTA complex, the adsorbed non-ionic surfactant and the leftover insoluble copper compounds like Cu(IO{sub 4}){sub 2} and Cu(IO{sub 3}){sub 2}, and then the hydrophobic polypropylene oxide segments of non-ionic surfactant can be effectively absorbed on the hydrophobic Cu–BTA complex as a supplement. The above two parts are integrated into a complete passivating film to protect the copper surface from chemical dissolution and excessive mechanical abrasion. - Highlights: • The copper

  13. Outgassing Properties of Chemically Polished Titanium Materials

    Science.gov (United States)

    Kurisu, Hiroki; Kimoto, Gou; Fujii, Hiroaki; Tanaka, Kazuhiko; Yamamoto, Setsuo; Matsuura, Mitsuru; Ishizawa, Katsunobu; Nomura, Takeru; Murashige, Nobuyuki

    We developed a chemical polishing (CP) for titanium materials applicable to ultrahigh vacuum (UHV) and extremely high vacuum (XHV) systems. The surface roughness, Ra, of the chemically polished titanium is obtained to be 25 nm by the atomic force microscopy measurement. This value is smaller than those of the base metal (BM) and the buff-polished (BP) samples. The thickness of the surface oxide layer of CP sample is estimated to be 7 nm by the cross section of transmission electron micrograph. Amount of desorption gas of CP sample obtained by the thermal desorption measurement is smaller than those of BM and BP sample, and is the same as that of the mechanochemically polished (MCP) sample. The outgassing rate of CP sample after baking at 150°C×20 h is obtained to be 7×10-13 Pa•m•s-1. This value is lower than that of standard vacuum materials by two orders of magnitude after the ordinary baking.

  14. Nano-scale stick-slip friction model for the chatter scratch generated by chemical mechanical polishing process.

    Science.gov (United States)

    Kim, Hong Jin; Yang, Ji Chul; Yoon, Bo Un; Lee, Hyeon-Deok; Kim, Taesung

    2012-07-01

    Although Chemical Mechanical Planarization (CMP) process is a still promising technology for the fabrication of the next generation devices, CMP-induced defects tackle further development of CMP process. In particular, even nano-sized scratches generated by CMP process kill the device directly. However mechanism of scratch formation was not clearly understood yet. CMP-induced scratches are classified as razor, chatter mark and skipping scratch. Among them, chatter mark scratch (or chatter scratch) is the most critical defect for the device yield loss. Chatter scratch has a periodic pattern of scars, which is reminiscent of a stick-slip friction pattern. Based on that similarity, stick-slip model was proposed in this paper in order to explain how chatter scratch is formed. And controlling parameters for chatter scratch are defined. During stick period the friction force that exceeds the yield strength of wafer surface makes chatter scratch and the distance between chatter marks is determined by slip period.

  15. Study of impurity distribution in mechanically polished, chemically treated and ultra-high vacuum degassed pure Niobium samples using TOFSIMS technique

    CERN Document Server

    Bose, A

    2015-01-01

    The performance of Superconducting radio frequency cavities (SCRF) are highly dependent on the surface treatment processes, which in turn is influenced by the chemistry within the penetration depth of Niobium (Nb). The present study analyses various impurities within the RF penetration depth (~50nm) of Nb samples treated by SCRF cavity processing techniques like colloidal silica polishing (simulating centrifugal barrel polishing), buffer chemical polishing (BCP), high pressure rinsing (HPR) and degassing under ultra high vacuum (UHV) condition at 600{\\deg}C for 10hrs. Various modes of Time of flight secondary ion mass spectrometry (TOFSIMS) technique was employed to study the effect of the above treatments on the vast spectrum of impurities that include interstitials, hydrocarbons, oxides, acidic residuals, reaction products and metallic impurities. UHV degassing treatment was the only treatment capable of reducing hydrogen contamination, but, it led to extensive oxygen, carbon and metallic impurities in the ...

  16. Surface texture and some properties of acrylic resins submitted to chemical polishing.

    Science.gov (United States)

    Braun, K O; Mello, J A N; Rached, R N; Del Bel Cury, A A

    2003-01-01

    The effects of chemical polishing on dental acrylic resin properties are not well clarified. This study evaluated the effect of chemical and mechanical polishing on the residual monomer release (RM), Knoop hardness (KH), transverse strength (TS) and surface texture (ST) of a heat- and self-cured acrylic resin. Four groups were formed: GI-self-cured resin/mechanical polishing; GII-self-cured resin/chemical polishing; GIII-heat-cured resin/mechanical polishing; GIV-heat-cured resin/chemical polishing. Following the polishing procedures, specimens were stored in distilled water at 37 degrees C. The KH and RM measurements were taken after 1, 2, 8 and 32 days of storage, and TS after 2, 8 and 32 days. Surface texture was observed under SEM evaluation. Results were compared statistically at a confidence level of 95%. The following conclusions were drawn: (1) regardless of the acrylic resin and the period of analysis, chemical polishing increased RM levels, reduced KH, and did not affect TS significantly; (2) water storage increased the surface hardness of GII and GIV; (3) GII and GIV showed a smooth and wavy surface under SEM evaluation.

  17. Potentiodynamic behaviour of mechanically polished titanium electrodes

    Energy Technology Data Exchange (ETDEWEB)

    Camara, O.R.; DePauli, C.P.; Giordano, M.C.

    1984-08-01

    The behaviour of titanium electrodes mechanically polished and/or anodically polarized at low positive potential in solutions at constant ionic strength between pH 0.3 and 11.0 is reported. The oxide electroformation potential on a mechanically polished electrode shows a complex dependence on the bulk solution pH. This dependence is similar to that obtained through acid-base titration with titanium as the indicating electrode. The formation of hydroxo-complexes on the spontaneously formed titanium oxide offers a possible explanation for the oxide electroformation potential dependence on pH. Anodic and cathodic wide current peaks are obtained between the potential of the hydrogen evolution and that of the massive oxide electroformation; the corresponding redox system becomes evident at pH 4.0 from the first potentiodynamic cycle. An interpretation of these processes involving the participation of non stoichiometric oxides and hydrogen ions is attempted.

  18. 固结磨料化学机械研抛K9玻璃的材料去除机理%Material Removal Mechanism of K9 Glass During Chemical Mechanical Polishing by Fixed Abrasive Pad

    Institute of Scientific and Technical Information of China (English)

    樊吉龙; 朱永伟; 李军; 叶剑锋

    2012-01-01

    采用失重法对固结磨料研抛K9玻璃材料去除过程中的机械与化学作用进行了分离,采用显微硬度方法分析了研抛液对K9玻璃工件表层硬度的影响.研究结果表明:研抛液能与K9玻璃发生化学反应并在其表面形成一层较基质材料软的变质层,变质层厚度随浸泡时间的延长而增加;单纯研抛液的化学作用对K9玻璃的材料去除作用有限,固结磨料研抛垫对K9玻璃的机械去除作用主要以脆性去除为主,化学与机械的交互作用是K9玻璃影响材料去除的主要方式:当研抛盘转速为200r/min时,化学作用与机械作用达到平衡,交互作用最为强烈,材料去除率达到最大值.%The mechanical and chemical functions during the material removal process are separated by adopting weight loss measurements when fixed abrasive pad works on K9 glass. The influence of polishing slurry on the surface hardness of K9 glass is also analyzed by the micro-hardness method. The research results show that the chemical reaction between polishing slurry and K9 glass will take place and form a denatured layer on the surface of K9 glass, which is softer than host material and whose thickness increases with soak time. The material removal rate of K9 glass by chemical function is very limited and the mechanical function of K9 glass is mainly by brittle removal, while the interaction of chemical and mechanical functions is the main factor in influencing the material removal rate of K9 glass. When the rotation speed of the polishing pad is 200 r/min, the chemical and mechanical functions come to a balance with their interaction being the strongest, and the material removal rate reaches its maximum.

  19. Effect of chemical polishing in titanium materials for low outgassing

    Science.gov (United States)

    Ishizawa, K.; Kurisu, H.; Yamamoto, S.; Nomura, T.; Murashige, N.

    2008-03-01

    A chemical polishing using a nitric acid solution was found to be the most suitable for the titanium materials. 1.8 nm of small surface roughness was observed in a microscopic range in 1 μm square, and 7 nm of a thin oxide layer was shown to exist for the chemically polished titanium. The surface processing for the titanium was developed combining the chemical polishing and the precision cleaning. The chemically polished pure titanium of JIS grade 2 showed extremely low outgassing rate below 10-12 Pams-1 after baking process, which is two orders of magnitude smaller than that for standard vacuum materials under the same baking condition. Outgassing rates of the titanium is about 1/5 of that for a stainless steel without baking process.

  20. Effect of chemical polishing in titanium materials for low outgassing

    Energy Technology Data Exchange (ETDEWEB)

    Ishizawa, K; Kurisu, H; Yamamoto, S [Graduate School of Science and Engineering, Yamaguchi University, Ube, Yamaguchi 755-8611 (Japan); Nomura, T; Murashige, N [CT division San-ai Plant Industries, Ltd, Kawasaki, Kanagawa 210-0821 (Japan)], E-mail: kishizawa@san-ai-oil.co.jp

    2008-03-01

    A chemical polishing using a nitric acid solution was found to be the most suitable for the titanium materials. 1.8 nm of small surface roughness was observed in a microscopic range in 1 {mu}m square, and 7 nm of a thin oxide layer was shown to exist for the chemically polished titanium. The surface processing for the titanium was developed combining the chemical polishing and the precision cleaning. The chemically polished pure titanium of JIS grade 2 showed extremely low outgassing rate below 10{sup -12} Pams{sup -1} after baking process, which is two orders of magnitude smaller than that for standard vacuum materials under the same baking condition. Outgassing rates of the titanium is about 1/5 of that for a stainless steel without baking process.

  1. 单晶金刚石机械研磨与化学机械抛光工艺%Mechanical Lapping and Chemical-Mechanical Polishing Process for Single Crystal Diamond

    Institute of Scientific and Technical Information of China (English)

    薛洪明; 金洙吉; 史卓颖

    2015-01-01

    单晶金刚石在工业、国防等领域的应用日益广泛,对其加工表面质量的要求不断提高,使用常温低压的化学机械抛光可实现金刚石的超光滑低损伤表面加工。通过理论分析及实验研究得出,使用硅酸盐玻璃材质研磨盘进行研磨加工,可以将金刚石表面粗糙度Ra降至15~25 nm,且无明显机械划痕;在2 MPa压力及室温环境下进行单晶金刚石化学机械抛光实验,优选出Fenton试剂酸性水基抛光液,使用该抛光液抛光单晶金刚石可获得粗糙度Ra值4 nm以下的光滑表面。%Single crystal diamond is more and more widely used in national defense and industrial field , which requires better surface quality .The technique of chemical-mechanical polishing at normal-tempera-ture and low-pressure environment can achieve ultra-smooth diamond surface with low damage .Theoreti-cal analysis and experimental research show that the polished diamond surface roughness Ra can be re-duced to 15—25 nm without obvious mechanical scratches by using silicate glass as grinding disc .The chemical-mechanical polishing experiment was held under the condition of 2 MPa pressure and normal-temperature .Experimental results show that the water-based acidic Fenton reagent was effective in parti-cular process parameters , and overall surface roughness Ra was processed to be less than 4 nm.

  2. Electrolyte composition and removal mechanism of Cu electrochemical mechanical polishing

    Institute of Scientific and Technical Information of China (English)

    边燕飞; 翟文杰; 程媛媛; 朱宝全; 王金虎

    2014-01-01

    The optimization of electrolytes and the material removal mechanisms for Cu electrochemical mechanical planarization (ECMP) at different pH values including 5-methyl-1H-benzotriazole (TTA), hydroxyethylidenediphosphoric acid (HEDP), and tribasic ammonium citrate (TAC) were investigated by electrochemical techniques, X-ray photoelectron spectrometer (XPS) analysis, nano-scratch tests, AFM measurements, and polishing of Cu-coated blanket wafers. The experimental results show that the planarization efficiency and the surface quality after ECMP obtained in alkali-based solutions are superior to that in acidic-based solutions, especially at pH=8. The optimal electrolyte compositions (mass fraction) are 6% HEDP, 0.3% TTA and 3% TAC at pH=8. The main factor affecting the thickness of the oxide layer formed during ECMP process is the applied potential. The soft layer formation is a major mechanism for electrochemical enhanced mechanical abrasion. The surface topography evolution before and after electrochemical polishing (ECP) illustrates the mechanism of mechanical abrasion accelerating electrochemical dissolution, that is, the residual stress caused by the mechanical wear enhances the electrochemical dissolution rate. This understanding is beneficial for optimization of ECMP processes.

  3. 铜抛光液中缓蚀剂5-氨基四唑(ATA)的作用机制研究%Investigation on the Mechanisms of Corrosion Inhibitor 5-aminotetrazole Used in the Copper Chemical Mechanical Polishing

    Institute of Scientific and Technical Information of China (English)

    刘宇宏; 董莹; 戴媛静; 雒建斌

    2012-01-01

    The influences of inhibitors ( benzotriazole( BTA)and 5-aminotetrazole( ATA) )in slurry with varying pH values on the chemical mechanical polishing( CMP) of copper were studied by the methods of the static corrosion, contact angle and X-ray photoelectron spectroscopy(XPS) ,and the effective mechanisms of ATA on copper surface were discussed. The results show that BTA and ATA are excellent copper corrosion inhibitors. In the range of pH values 3 - 10, the inhibitors form the passivity films and protect the copper surface from chemical attack, resulting in the decrease of the removal rates of copper and static corrosion rates,especially in the optimum condition of pH =4. ATA has better inhibition effect for copper corrosion than BTA in the range of pH =3 ~5, because ATA molecule can be preferentially adsorbed on copper surface by nitrogen atoms of amidogen and azole to form the protect films, resulting in the inhibition of the oxide formation from hydrogen peroxide and the improvement of the surface quality. In conclusion, ATA is one of the best inhibitors suitable for acid slurry of copper CMP.%采用静态腐蚀实验、接触角测试、XPS等手段,比较在不同pH值下抛光液中缓蚀剂(5-氨基四唑(ATA),苯并三唑(BTA))对铜表面化学机械抛光(CMP)的影响,并探讨ATA在铜表面的作用机制.结果表明,BTA和ATA是优良的铜缓蚀剂,当pH值为3~10时,两者可在铜表面成膜,保护铜表面不受腐蚀,从而降低铜片的静态腐蚀速率和去除率,其中当pH =4时,2种缓蚀剂表现出最佳的缓蚀性能.当pH值为3~5时,ATA的缓蚀性能优于BTA.ATA通过四唑环上的N原子和氨基上的N原子吸附在铜表面,形成保护膜,从而抑制了H2O2对铜表面的腐蚀,改善了表面质量,是一种优良的适用于酸性铜抛光液的缓蚀剂.

  4. The Effect of Heat Treatment and Mechanical Polishing on Nitinol Stent

    Energy Technology Data Exchange (ETDEWEB)

    Park, Sang Soo; Lee, Se Chol; Kim, Kyu Suk; Choi, Seong Hoon; Park, Chan Soo [Eulji University, Daejeon (Korea, Republic of); Yoon, Chang Jin; Kang, Sung Gwon [Seoul National University Bundang Hospital, Seongnam (Korea, Republic of); Park, Jae Hyung [Seoul National University Hospital, Seoul (Korea, Republic of)

    2009-09-15

    To understand the effect of heat treatment and mechanical polishing of a Nitinol wire on the chemical composition and physical morphology of the wire surface. Stents with a diameter of 1.0 cm, length of 8-10 cm, and composed of a Nitinol wire, were heat-treated at 500 .deg. C for 30 minutes, and mechanically polished with walnut shell granules. The wire surface morphology was studied with both an optical and a scanning electron microscope (SEM). In addition, an elemental analysis was performed by Energy Dispersive X-ray spectroscopy (EDX). Long microcracks along the wire direction and short microcracks across the wire were observed by SEM from the raw Nitinol wire. Upon heat treatment, the color of the wire turned blue, and Na, K, Cl, Si, Al atoms were seen from the EDX of the heat treated wire, which were absent in the original wire. The microcracks disappeared with the mechanical polishing, and the Na, K, Cl, Si, Al atoms all disappeared after the mechanical polishing. Mechanical polishing using walnut shell granules effectively removed the microcracks of a nitinol wire and impurities produced from the heat treatment.

  5. 铜化学机械抛光中复合缓蚀剂的作用机制%Mechanisms of Mixed Corrosion Inhibitors in Copper Chemical Mechanical Polishing

    Institute of Scientific and Technical Information of China (English)

    龚桦; 王宁; 顾忠华; 潘国顺

    2013-01-01

    将复合缓蚀剂(苯并三氮唑(BTAH)和十二烷基磺酸钠(SDS))应用到铜的化学机械抛光液中,考察BTAH和SDS对铜表面化学机械抛光的影响,并探讨BTAH和SDS在铜表面的作用机制;分析BTAH和SDS抛光液中络合剂和表面活性剂对铜化学机械抛光性能的影响。结果表明:BTAH和SDS在铜表面形成了致密的Cu-BTAH和Cu-SDS保护膜,是优良的铜缓蚀剂。当以磷酸氢二胺(AHP)为络合剂,羟乙基纤维素(HEC)为表面活性剂时,优化后的BTAH和SDS抛光液取得了低至Ra0.2 nm的表面粗糙度,同时发现HEC有降低纳米颗粒残留的作用。%Mixed corrosion inhibitors(benzotriazole(BTAH)and sodium dodecyl sulfate(SDS))were utilized in copper chemical mechanical polishing(CMP)slurry.The influences of BTAH and SDS,complexing agent,and surfactant on the CMP of copper were studied,and the mechanisms of BTAH and SDS on copper surface were discussed.The results show that compact Cu-BTAH and Cu-SDS protective films are formed on the copper surface,and thus,which are excellent copper corrosion inhibitors.When using BTAH and SDS as mixed corrosion inhibitors,ammonium phosphate(AHP)as complexing agent,and hydroxy ethyl cellulose(HEC)as surfactant,a low surface roughness of 0.2 nm is got by this CMP slurry.The appearance of HEC in the slurry is found to be very effective in reducing the nano-sized particle deposition on copper surface.

  6. Defect-free surface of quartz glass polished in elastic mode by chemical impact reaction

    Institute of Scientific and Technical Information of China (English)

    彭文强; 关朝亮; 李圣怡

    2014-01-01

    Removal of brittle materials in the brittle or ductile mode inevitably causes damaged or strained surface layers containing cracks, scratches or dislocations. Within elastic deformation, the arrangement of each atom can be recovered back to its original position without any defects introduced. Based on surface hydroxylation and chemisorption theory, material removal mechanism of quartz glass in the elastic mode is analyzed to obtain defect-free surface. Elastic contact condition between nanoparticle and quartz glass surface is confirmed from the Hertz contact theory model. Atoms on the quartz glass surface are removed by chemical bond generated by impact reaction in the elastic mode, so no defects are generated without mechanical process. Experiment was conducted on a numerically controlled system for nanoparticle jet polishing, and one flat quartz glass was polished in the elastic mode. Results show that scratches on the sample surface are completely removed away with no mechanical defects introduced, and micro-roughness (Ra) is decreased from 1.23 nm to 0.47 nm. Functional group Ce—O—Si on ceria nanoparticles after polishing was detected directly and indirectly by FTIR, XRD and XPS spectra analysis from which the chemical impact reaction is validated.

  7. 钨的化学机械抛光过程中TiN-W电偶的腐蚀行为%Galvanic Corrosion of TiN-W Electro-couple During Tungsten Chemical Mechanical Polishing

    Institute of Scientific and Technical Information of China (English)

    程璇; 林昌健

    2001-01-01

    Chemical-mechanical polishing (CMP) is a process whereby mechanical and chemical forces are combined to remove material from a wafer and polish it to a flat surface. Tungsten CMP is an important process to gain the global planarity of silicon wafers with tungsten (W) plugs. Tungsten is actually deposited on a thin adhesive layer of titanium nitride (TiN) on silicon. When close to the final stage of polishing, TiN and W will be simultaneously exposed to the polishing chemistry, forming a galvanic couple. The corrosion of TiN and W couple will result in different polish rate.   This work studied the potential difference and galvanic currents on particulate contamination of the abrasive on the patterned surface and on corrosion behaviors of TiN and W. The polarization curves of TiN and W were, respectively, obtained in 0.01 mol/L KNO3 solutions in the absence and presence of three typical oxidants (H2O2, KIO3, Fe(NO3)3) by DC polarization technique. The corrosion potentials and galvanic currents were measured when TiN and W were placed in a specially designed electrochemical cell to form electro-couple. The preliminary results revealed that the corrosion rate of TiN-W electro-couple significantly increased in the presence of 4.5% H2O2 at pH 4.0, while reduced to the minimal in the presence of Fe(NO3)3 at pH 1.5. Agitation significantly enhanced the corrosion rate of TiN-W couple.%化学机械抛光(CMP)技术是同时利用化学和机械作用来获得固体表面亚微米尺度上平整性非常有效的方法,从90年代初期起已成为制备高质量镜头和镜面及集成电路制造过程中硅片表面预处理工艺中最常用的技术之一.钨的化学机械抛光是用钨坯获得硅片球面平整度的重要工艺.其过程实际上是先将钨沉积到硅上已有的薄粘附层-氮化钛上,然后进行化学机械抛光.当抛光阶段接近终了时,氮化钛和钨表面将同时暴露在化学抛光液中形成电偶对,并在界

  8. 化学机械抛光在光学晶体加工中的应用%Application of chemical mechanical polishing in the processing of optical crystals

    Institute of Scientific and Technical Information of China (English)

    储向峰; 汤丽娟; 董永平; 乔红斌; 朱小华

    2012-01-01

    Intensive investigation on crystal materials accelerated the development of modern science and technology, and the demand for various crystals has been increasing. The surface processing of crystals has become a research focus because ultra-smooth surface is needed in many application fields, In this research, we introduce the development of chemical mechanical polishing of a few kinds of crystals including saphire, LiNbO3, LiB3 O5, CdZnTe, MgO, SiC and InSb, discuss the existing problems and the developing trend in the CMP field of the crystals.%晶体材料的深入研究加速了现代科学技术的发展,其需求量也迅速增加.在很多应用领域要求晶体的表面超光滑,因此晶体表面处理和加工成为目前研究的热点.介绍了几种典型光学晶体(蓝宝石晶体、铌酸锂晶体、三硼酸锂晶体、碲锌镉晶体、氧化镁晶体、碳化硅晶体和锑化铟晶体)化学机械抛光的最新研究成果,并探讨了光学晶体化学机械抛光存在的问题及发展趋势.

  9. Chemical Mechanical Polishing of Os in H3PO4-Based Slurries%锇在磷酸体系抛光液中化学机械抛光研究

    Institute of Scientific and Technical Information of China (English)

    储向峰; 汤丽娟; 董永平; 乔红斌; 朱小华

    2013-01-01

    (锇有可能作为大规模集成电路铜互连扩散阻挡层新材料.)利用自制的抛光液对金属锇片进行抛光,研究在双氧水-磷酸体系抛光液中H2O2浓度和抛光液pH值对抛光速率的影响.结果表明,当抛光液中主要成分仅为氧化剂H2O2时,并不能在金属锇表面达到好的腐蚀效果.在磷酸体系抛光液中,H2O2能够通过促进阴极反应的进行从而增强抛光液对金属锇的化学作用;低浓度H2O2通过增强抛光液对金属锇的化学腐蚀能力,从而增加了抛光速率值:较高浓度H2O2的加入对抛光速率值影响较小.H3PO4能够在抛光液中起到抑制剂、pH调节剂和络合剂的作用.当抛光液pH值为4.0时,金属锇表面生成的钝化膜最致密.当pH值为4.0或5.0时,金属锇表面生成的钝化膜OCP值大于金属锇的OCP值,且此条件下的抛光速率值较高.%Osmium (Os) may be used in copper interconnects of ultra-large scale integration as a new barrier material.In this work,chemical mechanical polishing experiments were performed on Os disk using home-made H3PO4-based slurries and the effect of the H2O2 concentration and pH value on the material removal rate (MRR) was investigated.Good corrosion cannot be obtained on Os surface when only H2O2 is the main components in slurry.In H3PO4-based slurries,H2O2 can accelerate the cathode reaction and enhance the chemical action of the slurry on the surface of Os.Low concentration H2O2 promotes the chemical corrosion ability to corrode Os surface and increases the material removal rate; the increasing of H2O2 concentration has less influences on the MRR when the concentration of H2O2 is higher.Phosphoric acid plays a role of inhibitor,pH adjusting agent and complexing agent in the slurry.When pH value is 4.0,the passive film on the surface of Os is most compact.The OCP values of the passive films formed on the surface of Os are higher than those of Os and the MRR attains higher values when the pH value

  10. Electrochemical and mechanical polishing and shaping method and system

    Science.gov (United States)

    Engelhaupt, Darell E. (Inventor); Gubarev, Mikhail V. (Inventor); Jones, William David (Inventor); Ramsey, Brian D. (Inventor); Benson, Carl M. (Inventor)

    2011-01-01

    A method and system are provided for the shaping and polishing of the surface of a material selected from the group consisting of electrically semi-conductive materials and conductive materials. An electrically non-conductive polishing lap incorporates a conductive electrode such that, when the polishing lap is placed on the material's surface, the electrode is placed in spaced-apart juxtaposition with respect to the material's surface. A liquid electrolyte is disposed between the material's surface and the electrode. The electrolyte has an electrochemical stability constant such that cathodic material deposition on the electrode is not supported when a current flows through the electrode, the electrolyte and the material. As the polishing lap and the material surface experience relative movement, current flows through the electrode based on (i) adherence to Faraday's Law, and (ii) a pre-processing profile of the surface and a desired post-processing profile of the surface.

  11. Evaluation of hardness and color stability in the soft lining materials after thermocycling and chemical polishing.

    Science.gov (United States)

    Goiato, Marcelo Coelho; Falcón-Antenucci, Rosse Mary; Santos, Daniela Micheline dos; Pellizzer, Eduardo Piza

    2009-01-01

    The aim of this study was to evaluate the Shore A hardness and color stability of two soft lining materials after thermocycling and when chemical polishing was used or omitted. Two acrylic-based soft lining materials were tested: Coe-Soft and Soft Confort, 14 specimens were made for each material. They were distributed in four groups according to the treatment performed. The specimens were thermocycled (1000 cycles) and half of the group submitted to chemical polishing (methyl methacrylate). Shore A hardness was determined and color stability was calculated by means of Commission International de l'Eclairage Lab uniform color scale using a spectrophotometer, the measurements were made immediately after deflasked, chemical polishing and thermocycling. Analysis of variance (ANOVA) and Tukey's tests were performed at p Confort (10.60) showed significantly higher values than Coe-Soft (4.57). Coe-Soft (26.42) showed higher Shore A hardness values than Soft Confort (19.42). Chemical polishing did not influence in the color stability of both materials; however, influenced in the hardness values of Coe-Soft.

  12. Chemical Mechanical Planarization (CMP) for Microelectronic Applications

    Institute of Scientific and Technical Information of China (English)

    Li Yuzhuo

    2004-01-01

    Surface planarity is of paramount importance in microelectronics. Chemical Mechanical Polishing (CMP) is the most viable approach to address the planarity issues during the fabrication of advanced semiconductor devices. With the integration of copper as interconnect and low k materials as dielectric, the CMP community is facing an ever increasing demand on reducing defectivity without scarifying production throughput. Key issues in CMP today include reduction of surface defectivity and enhancement of planarization efficiency. More specifically, the polished surface should be free of defects such as scratches, pits, corrosion spots, and residue particles. To accomplish these goals, we have investigated a wide range of pathways including reduction of oversized particles,use of unique abrasives such as functionalized nanoparticles, and development of polishing solution without abrasive particles.In this presentation, some fundamental aspects of the CMP process will be given first.Several academic and industrial examples will be used to illustrate the issues and challenges during the implementation of various slurry designs into the CMP processes.

  13. Voltage-induced material removal mechanism of copper for electrochemical-mechanical polishing applications

    Institute of Scientific and Technical Information of China (English)

    Sang-Jun HAN; Yong-Jin SEO

    2009-01-01

    The current-voltage (Ⅰ-Ⅴ) curves, such as linear sweep voltammetry (LSV) and cyclic voltammetry (CV), were employed to evaluate the effect of electrolyte concentration on the electrochemical reaction trend. From the Ⅰ-Ⅴ curve, the electrochemical states of active, passive, transient and trans-passive region could be characterized. And then, the mechanism of the process of voltage-induced material removal in electrochemical mechanical polishing (ECMP) of copper was investigated. Scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) analyses were used to observe the surface profile. Finally, the oxidation and reduction processes of the Cu surface were monitored by the repetition of anodic and cathodic potential from cyclic voltammetry (CV) method in acid- and alkali-based electrolyte.

  14. Investigation of the surface generation mechanism of mechanical polishing engineering ceramics using discrete element method

    Science.gov (United States)

    Han, Xuesong

    2014-09-01

    Machining technology about ceramics has been developed very fast over recent years due to the growing industrial demand of higher machining accuracy and better surface quality of ceramic elements, while the nature of hard and brittle ceramics makes it difficult to acquire damage-free and ultra-smooth surface. Ceramic bulk can be treated as an assemblage of discrete particles bonded together randomly as the micro-structure of ceramics consists of crystal particles and pores, and the inter-granular fracture of the ceramics can be naturally represented by the separation of particles due to breakage of bonds. Discrete element method (DEM) provides a promising approach for constructing an effective model to describe the tool-workpiece interaction and can serve as a predicting simulation tool in analyzing the complicated surface generation mechanism and is employed in this research to simulate the mechanical polishing process of ceramics and surface integrity. In this work, a densely packed particle assembly system of the polycrystalline Si3N4 has been generated using bonded-particle model to represent the ceramic workpiece numerically. The simulation results justify that the common critical depth of cut cannot be used as the effective parameters for evaluating brittle to ductile transformation in ceramic polishing process. Therefore, a generalized criterion of defining the range of ductile regime machining has been developed based on the numerical results. Furthermore, different distribution of pressure chain is observed with different depth of cut which ought to have intense relationship with special structure of ceramics. This study also justified the advantage of DEM model in its capability of revealing the mechanical behaviors of ceramics at micro-scale.

  15. Colloid Aspects of Chemical-Mechanical Planarization

    Directory of Open Access Journals (Sweden)

    Matijević, E.

    2010-09-01

    Full Text Available The essential parts of interconnects for silicon based logic and memory devices consist of metal wiring (e.g. copper, a barrier metal (Ta, TaN, and of insulation (SiO2 , low-k polymer. The deposition of the conducting metal cannot be confined to trenches, resulting in additional coverage of Cu and Ta/TaN on the surface of the dielectrics, yielding an electrically conducting continuous but an uneven surface. The surplus metal must be removed until a perfectly flat surface consisting of electrically isolated metal lines is achieved with no imperfections. This task is accomplished by the chemical-mechanical planarization (CMP process, in which the wafer is polished with a slurry containing abrasives of finely dispersed particles in submicrometer to nanometer size. The slurries also contain dissolved chemicals to modify the surfaces to be planarized. Eventually the final product must be cleared of any adhered particles and debris left after polishing is completed. Obviously the entire process deals with materials and interactions which are the focal subjects of colloid and surface science, such as the natures of abrasive particles and their stability in the slurry, the properties of various surfaces and their modifications, adhesion and detachment of the particles and different methods for the characterization of constituents, as well as elucidation of the relevant interfacial phenomena. This review endeavors to describe the colloid approach to optimize the materials and processes in order to achieve desirable polish rates and final surfaces with no imperfections. Specifically, the effects of the composition, size, shape, and charge of abrasive particles on the polish process and the quality of planarized wafers is described in detail. Furthermore, the interactions of metal surfaces with oxidizing, chelating, and other species which affect the dissolution and surface modification of metal (copper surfaces are illustrated and related to the

  16. Polish Yellow Sweet Clover (Melilotus officinalis L. Honey, Chromatographic Fingerprints, and Chemical Markers

    Directory of Open Access Journals (Sweden)

    Izabela Jasicka-Misiak

    2017-01-01

    Full Text Available A case study of Polish Melilotus officinalis honey was presented for the first time. Gas chromatography–mass spectrometry (GC-MS (after steam distillation, Soxhlet extraction, ultrasonic solvent extraction, and solid phase extraction (SPE and targeted high performance liquid chromatography with a photodiode array detector (HPLC-PAD were applied to determine the characteristic components of honey. While ubiquitous in most honeys, carbohydrates, terpene derivatives, and phenylacetic acid dominated in the Soxhlet extracts (25.54% and in the application of SPE (13.04%. In addition, lumichrome (1.85% was found, and may be considered as a marker of this honey. Due to the presence of these compounds, Polish yellow sweet clover honey is similar to French lavender honeys. The major compounds determined in the methanolic extract were (+-catechine (39.7% and gallic acid (up to 30%, which can be regarded as specific chemical markers of the botanical origin of melilot honey. With respect to total phenolic and flavonoid contents, 1,1-diphenyl-2-picrylhydrazyl (DPPH assays were determined spectrophotometrically. The honey exhibited a moderate antioxidant activity, typical for light honeys, which correlates well with its phenolic and flavonoid composition.

  17. Laser polishing of niobium for SRF applications

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Liang; Klopf, J. Michael [JLAB; Reece, Charles E. [JLAB; Kelley, Michael [W& M

    2013-09-01

    Smooth interior surfaces are desired for niobium SRF cavities, now obtained by buffered chemical polish (BCP) and/or electropolish (EP). Laser polishing is a potential alternative, having advantages of speed, freedom from chemistry and in-process inspection. Here we show that laser polishing can produce smooth topography with Power Spectral Density (PSD) measurements similar to that obtained by EP. We studied the influence of the laser power density and laser beam raster rate on the surface topography. These two factors need to be combined carefully to smooth the surface without damaging it. Computational modeling was used to simulate the surface temperature and explain the mechanism of laser polishing.

  18. Polish Society of Endocrinology Position statement on endocrine disrupting chemicals (EDCs).

    Science.gov (United States)

    Rutkowska, Aleksandra; Rachoń, Dominik; Milewicz, Andrzej; Ruchała, Marek; Bolanowski, Marek; Jędrzejuk, Diana; Bednarczuk, Tomasz; Górska, Maria; Hubalewska-Dydejczyk, Alicja; Kos-Kudła, Beata; Lewiński, Andrzej; Zgliczyński, Wojciech

    2015-01-01

    With the reference to the position statements of the Endocrine Society, the Paediatric Endocrine Society, and the European Society of Paediatric Endocrinology, the Polish Society of Endocrinology points out the adverse health effects caused by endocrine disrupting chemicals (EDCs) commonly used in daily life as components of plastics, food containers, pharmaceuticals, and cosmetics. The statement is based on the alarming data about the increase of the prevalence of many endocrine disorders such as: cryptorchidism, precocious puberty in girls and boys, and hormone-dependent cancers (endometrium, breast, prostate). In our opinion, it is of human benefit to conduct epidemiological studies that will enable the estimation of the risk factors of exposure to EDCs and the probability of endocrine disorders. Increasing consumerism and the industrial boom has led to severe pollution of the environment with a corresponding negative impact on human health; thus, there is great necessity for the biomonitoring of EDCs in Poland.

  19. Mechanical polishing as an improved surface treatment for platinum screen-printed electrodes

    Directory of Open Access Journals (Sweden)

    Junqiao Lee

    2016-07-01

    Full Text Available The viability of mechanical polishing as a surface pre-treatment method for commercially available platinum screen-printed electrodes (SPEs was investigated and compared to a range of other pre-treatment methods (UV-Ozone treatment, soaking in N,N-dimethylformamide, soaking and anodizing in aqueous NaOH solution, and ultrasonication in tetrahydrofuran. Conventional electrochemical activation of platinum SPEs in 0.5 M H2SO4 solution was ineffective for the removal of contaminants found to be passivating the screen-printed surfaces. However, mechanical polishing showed a significant improvement in hydrogen adsorption and in electrochemically active surface areas (probed by two different redox couples due to the effective removal of surface contaminants. Results are also presented that suggest that SPEs are highly susceptible to degradation by strong acidic or caustic solutions, and could potentially lead to instability in long-term applications due to continual etching of the binding materials. The ability of SPEs to be polished effectively extends the reusability of these traditionally “single-use” devices.

  20. Modeling and Simulation of Abrasive Flow in Chemical Mechanical Polishing Using Discrete Element Method%化学机械抛光中磨粒运动特性离散元仿真研究

    Institute of Scientific and Technical Information of China (English)

    谭援强; 张浩; 李明军

    2011-01-01

    According to coupling computational fluid dynamics and computational granular media mechanics method, the motion of abrasive flow in CMP with composite particles was simulated using discrete element method. With PFC3D software, a two-phase flow model that predicted the kinematics and trajectory of the abrasive particles was built herein,two verification simulations were conducted to demonstrate the capability of the current method to solve nano-size two-phase flow problems. Finally, the CMP geometry simulations were conducted, some phenomenon observed in the experiments were explained.%基于耦合计算流体力学和计算散体力学的方法,利用PFC3D软件模拟了复合磨粒抛光液化学机械抛光(CMP)中抛光液固液两相流的流动行为.通过2个数值实验并将其与他人实验数据进行对比,验证了利用PFC3D软件模拟纳米两相流问题的可行性.对CMP过程进行了数值模拟,解释了一些实验中观测到的现象.

  1. Chemical and morphological features of nanofilled composite resin: influence of finishing and polishing procedures and fluoride solutions.

    Science.gov (United States)

    de Oliveira, Ana Luísa Botta Martins; Domingos, Patrícia Aleixo Dos Santos; Palma-Dibb, Regina Guenka; Garcia, Patrícia Petromilli Nordi Sasso

    2012-02-01

    This study evaluated the influence of finishing and polishing procedures and different fluoride solutions on superficial morphology and chemistry of the nanofilled composite resin Supreme XT (3M) through the EDX analysis and SEM evaluation. Circular specimens (n = 30) of 10 mm diameter and 2 mm thickness were prepared, with half of the sample assays finished and polished with Super-Snap® sandpaper. The experimental groups were divided according to the presence or absence of finishing and polishing and solutions (artificial saliva, 0.05% of manipulated sodium fluoride solution, Fluordent Reach, Oral B, Fluorgard). Specimens were immersed in each respective solution for 1 min per day, during 60 days and stored in artificial saliva at 37 ± 1°C between immersion periods. Topography and chemical analysis was qualitative. It was observed that specimens submitted to finishing and polishing procedures had lower superficial degradation. Fluoride solutions promoted superficial alterations on specimens, being the highest degradation obtained with Fluordent Reach. It can be concluded that finishing and polishing procedures and the immersion media influence the superficial morphology of composite resin tested; the Fluordent Reach was the fluoride solution that most affected the material's surface.

  2. The intrinsically high pitting corrosion resistance of mechanically polished nitinol in simulated physiological solutions.

    Science.gov (United States)

    Bai, Zhijun; Rotermund, Harm H

    2011-10-01

    Nitinol wires have been widely used in many biomedical applications, such as cardiovascular stent due to their superelasticity and shape memory effect. However, their corrosion properties and the related biocompatibility are not well understood, and the reported results are controversial. In this study, we evaluate the pitting corrosion property of nitinol, titanium, nickel, and 316L stainless steel (316LSS) wires with different surface roughnesses in a saline solution at 37 °C. The cyclic potentiodynamic polarization results show that mechanically polished nitinol and Ti wires are highly resistant to pitting corrosion, while Ni and 316LSS wires are susceptible to pitting corrosion. Electrochemical impedance spectroscopy is used to study the interface of oxide film/solution and all mechanically polished nitinol wires are covered by 2-3 nm thick films formed under open circuit potential. Furthermore, the electronic structures and semiconducting properties of passive films on nitinol, Ti and Ni wires are studied by Mott-Schottky analysis. Passive films formed on nitinol and Ti exhibit n-type semiconducting characteristics, whereas films on Ni show p-type semiconducting characteristics. Scanning Kelvin Microscopy is used to measure the surface potential difference between common inclusions from the nitinol matrix and the results indicate that the inclusions are more electrochemically noble than the nitinol matrix. Band energy theory is used to model the electrochemical interface between the passive films of nitinol and the solution under different applied potential conditions. A mechanism for the strong pitting corrosion resistance of nitinol in saline solution is proposed.

  3. Surface studies of niobium chemically polished under conditions for superconducting radiofrequency cavity production

    Energy Technology Data Exchange (ETDEWEB)

    Hui Tian; Michael Kelley; Charles Reece

    2005-11-14

    The performance of niobium superconducting radiofrequency accelerator cavities is strongly impacted by the topmost several nanometers of the active (interior) surface, especially by the final surface conditioning treatments. We examined the effect of the most commonly employed treatment, buffered chemical polishing (BCP), on polycrystalline niobium sheet over a range of realistic solution flow rates using electron back scatter diffraction (EBSD), stylus profilometry, atomic force microscopy, laboratory XPS and synchrotron (variable photon energy) XPS, seeking to collect statistically significant data sets. We found that the predominant general surface orientation is (100), but others are also present and at the atomic-level details of surface plane orientation are more complex. The post-etch surface exhibits micron-scale roughness, whose extent does not change with treatment conditions. The outermost surface consists of a few-nm thick layer of niobium pentoxide, whose thickness increases with solution flow rate to a maximum of 1.3 - 1.4 times that resulting from static solution. The standard deviation of the roughness measurements is ?? 30% and that of the surface composition is ?? 5%.

  4. Surface studies of niobium chemically polished under conditions for superconducting radio frequency (SRF) cavity production

    Energy Technology Data Exchange (ETDEWEB)

    Tian Hui [Thomas Jefferson National Accelerator Facility and College of William and Mary (United States); Reece, Charles E. [Thomas Jefferson National Accelerator Facility and College of William and Mary (United States); Kelley, Michael J. [Thomas Jefferson National Accelerator Facility and College of William and Mary (United States)]. E-mail: mkelley@jlab.org; Wang Shancai [Department of Physics, Boston University (United States); Plucinski, Lukasz [Department of Physics, Boston University (United States); Smith, Kevin E. [Department of Physics, Boston University (United States); Nowell, Matthew M. [EDAX TSL (United States)

    2006-11-30

    The performance of niobium superconducting radiofrequency (SRF) accelerator cavities is strongly impacted by the topmost several nanometers of the active (interior) surface, especially as influenced by the final surface conditioning treatments. We examined the effect of the most commonly employed treatment, buffered chemical polishing (BCP), on polycrystalline niobium sheet over a range of realistic solution flow rates using electron back scatter diffraction (EBSD), stylus profilometry, atomic force microscopy, laboratory XPS and synchrotron (variable photon energy) XPS, seeking to collect statistically significant datasets. We found that the predominant general surface orientation is (1 0 0), but others are also present and at the atomic-level details of surface plane orientation are more complex. The post-etch surface exhibits micron-scale roughness, whose extent does not change with treatment conditions. The outermost surface consists of a few-nm thick layer of niobium pentoxide, whose thickness increases with solution flow rate to a maximum of 1.3-1.4 times that resulting from static solution. The standard deviation of the roughness measurements is {+-}30% and that of the surface composition is {+-}5%.

  5. Review on Application of Rare Earth Polishing Powders in Glass Polishing

    Institute of Scientific and Technical Information of China (English)

    Li Xueshun; Yang Guosheng

    2004-01-01

    The paper reviewed different explanations to the mechanism of glass polishing, the practices of glass polishing and the preparation of polishing powders, addressed the growth mechanism of CeO2 crystals, summarized the roles of rare earth elements in glass polishing and the factors that may influence the polishing effects, and specified the existing problems in glass polishing.

  6. Evaluation of subsurface damage in GaN substrate induced by mechanical polishing with diamond abrasives

    Energy Technology Data Exchange (ETDEWEB)

    Aida, Hideo, E-mail: h-aida@namiki.net [NJC Institute of Technology, Namiki Precision Jewel Co., Ltd., 3-8-22 Shinden, Adachi, Tokyo 123-8511 (Japan); KASTEC, Kyushu University, Kasuga-shi, Fukuoka 816-8580 (Japan); Takeda, Hidetoshi; Kim, Seong-Woo; Aota, Natsuko; Koyama, Koji [NJC Institute of Technology, Namiki Precision Jewel Co., Ltd., 3-8-22 Shinden, Adachi, Tokyo 123-8511 (Japan); Yamazaki, Tsutomu; Doi, Toshiro [KASTEC, Kyushu University, Kasuga-shi, Fukuoka 816-8580 (Japan)

    2014-02-15

    The relationship between the depth of the subsurface damage (SSD) and the size of the diamond abrasive used for mechanical polishing (MP) of GaN substrates was investigated in detail. GaN is categorized as a hard, brittle material, and material removal in MP proceeds principally to the fracture of GaN crystals. Atomic force microscopy and cathodoluminescence imaging revealed that the mechanical processing generated surface scratches and SSD. The SSD depth reduced as the diamond abrasive size reduced. A comparison of the relationship between the SSD depth and the diamond abrasive size used in the MP of GaN with the same relationship for typical brittle materials such as glass substrates suggests that the MP of GaN substrates proceeds via the same mechanism as glass.

  7. The impact of polishing on germanium-on-insulator substrates

    Institute of Scientific and Technical Information of China (English)

    Lin Wang; Ruan Yujiao; Chen Songyan; Li Cheng; Lai Hongkai; Huang Wei

    2013-01-01

    We prepared germanium-on-insulator (GOI) substrates by using Smart-CutTM and wafer bonding technology.The fabricated GOI is appropriate for polishing due to a strong bonding strength (2.4 MPa) and a sufficient bonding quality.We investigated mechanical polishing and chemical-mechanical polishing (CMP) systematically,and an appropriate polishing method-mechanical polishing combined with CMP-is obtained.As shown by AFM measurement,the RMS of GOI after polishing decreased to 0.543 nm.And the Ge peak profile of the XRD curve became symmetric,and the FWHM is about 121.7 arcsec,demonstrating a good crystal quality.

  8. Chemical Mechanical Planarization of Cu: Nanoscale Processes

    Science.gov (United States)

    Arthur, Michael; Fishbeck, Kelly; Muessig, Kara; McDonald, James; Williams, Christine; White, Daniel; Koeck, Deborah; Perry, Scott; Galloway, Heather

    2002-10-01

    Interconnect lines in state of the art integrated circuits are made of copper in a process that requires the repeated planarization of the copper layer. During this process the material is subjected to an aqueous slurry containing active chemicals, corrosion inhibitors and abrasive particles. A model slurry buffered to pH2, pH4 and pH6, contained nitric acid, silica particles and benzotriazole (BTA) as a corrosion inhibitor. The degree of copper planarization was investigated as a function of slurry composition and pH using atomic force microscopy. Chemical surface changes can be explained by the effect of slurry composition on the charge at the material surface. This surface charge controls the amount of friction between the abrasive and the surface which, in turn, effects the global planarization of the material. Experiments using a macroscopic polishing system with AFM characterization along with the microscopic interaction of the AFM tip and sample provide insights into the fundamental mechanisms of a planarization process.

  9. 镁合金化学抛光工艺%Chemical polishing process of magnesium alloy

    Institute of Scientific and Technical Information of China (English)

    周游; 姚颖悟; 吴坚扎西; 吕千

    2012-01-01

    研究了一种应用于AZ31镁合金的化学抛光工艺.通过考察抛光液组成及工艺参数对镁合金失重和反射率的影响,确定了较佳的抛光工艺条件为:磷酸650 mL/L,丙三醇250 mL/L,柠檬酸0.6 g/L,硫酸铜0.5 g/L,温度50℃,时间3 min.经此条件抛光后的镁合金表面平整光亮,失重为23 g/cm2,反射率为50%,在3.5%(质量分数)NaCl溶液中的腐蚀电位比未抛光时正移0.9 V,腐蚀电流密度下降近一个数量级,耐蚀性提高.%A chemical polishing process for AZ31 Mg alloy was studied. The effects of composition of polishing solution and process parameters on weight loss and reflectivity of the Mg alloy were discussed. The optimal polishing process conditions were obtained as follows: H3PO4 650 mL/L, glycerol 250 mL/L, citric acid 0.6 g/L, copper sulfate 0.5 g/L, temperature 50 °C, and time 3 min. The Mg alloy surface polished under the above conditions is level and bright, and has a weight loss of 23 g/cm2 and a reflectivity of 50%. The corrosion resistance of the Mg alloy is improved after polishing due to the positive shift of corrosion potential by 0.9 V and the decrease of corrosion current density by nearly one order of magnitude in 3.5wt% NaCl solution as compared with the Mg alloy without polishing.

  10. Summaries of the 40. Scientific Assembly of Polish Chemical Society and Association of Engineers and Technicians of Chemical Industry; Streszczenia 40. Zjazdu Naukowego Polskiego Towarzystwa Chemicznego i Stowarzyszenia Inzynierow i Technikow Przemyslu Chemicznego

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1997-12-31

    Annual 40. Scientific Assembly of Polish Chemical Society and Association of Engineers and Technicians of Chemical Industry has been held in Gdansk on 22-26 September 1997. The most valuable scientific results obtained in Polish Laboratories have been presented in 22 main sections and 7 symposia directed especially at following subjects: analytical chemistry, biochemistry, solid state chemistry and material science, physical chemistry, heteroorganic and coordination chemistry, medical and pharmaceutical chemistry, metalorganic chemistry, inorganic and organic chemistry, polymers chemistry, chemistry and environment protection, theoretical chemistry, chemical didactics, photochemistry, radiation chemistry and chemical kinetics, chemical engineering, catalysis, crystallochemistry, chemical technology, electrochemistry, and instrumental methods.

  11. Chemical roles on Cu-slurry interface during copper chemical mechanical planarization

    Science.gov (United States)

    Li, Jing; Liu, Yuhong; Pan, Yan; Lu, Xinchun

    2014-02-01

    In order to optimize the existing slurry for low down-pressure chemical mechanical polishing/planarization (CMP), copper CMP was conducted in H2O2 based slurries with benzotriazole (BTA) and glycine at different pH values. The film composition was investigated by the Nano Hardness Tester and XPS tests. Furthermore, the film structure forming on the copper surface at different pH values was investigated by adopting electrochemical impedance spectroscopy (EIS) technology. In the acidic slurry, discontinuous and porous BTA film covering the Cu/Cu2O surface enhanced the mechanical effect during Cu CMP process, resulted in highest CMP removal rate. In neutral slurry, the lowest CMP removal rate and static corrosion rate were resulted from compacted passivation film on the copper surface. In the alkaline slurry, the mechanical effect was limited by the rapid chemical dissolution. The results will benefit optimization of the slurry and operate conditions during low down-pressure CMP process.

  12. Reduction of Residual Stresses in Sapphire Cover Glass Induced by Mechanical Polishing and Laser Chamfering Through Etching

    Directory of Open Access Journals (Sweden)

    Shih-Jeh Wu

    2016-10-01

    Full Text Available Sapphire is a hard and anti-scratch material commonly used as cover glass of mobile devices such as watches and mobile phones. A mechanical polishing using diamond slurry is usually necessary to create mirror surface. Additional chamfering at the edge is sometimes needed by mechanical grinding. These processes induce residual stresses and the mechanical strength of the sapphire work piece is impaired. In this study wet etching by phosphate acid process is applied to relief the induced stress in a 1” diameter sapphire cover glass. The sapphire is polished before the edge is chamfered by a picosecond laser. Residual stresses are measured by laser curvature method at different stages of machining. The results show that the wet etching process effectively relief the stress and the laser machining does not incur serious residual stress.

  13. Materials of yearly scientific assembly of Polish Chemical Society, Lublin 1995; Materialy ze zjazdu naukowego Polskiego Towarzystwa Chemicznego, Lublin 1995

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1995-12-31

    Scientific conference accompanied the yearly assembly of Polish Chemical Society has bee held in 1995 in Lublin. The general review on scientific progress of the most important field of chemistry in Poland have been presented. The conference has been divided into 16 plenary sessions and 3 microsymposia. The sessions topics as follows: S-1 - physical chemistry; S-2 - physicochemistry of the surface; S-3 - catalysis; S-4 - chemical technology; S-5 - inorganic chemistry; S-6 - coordination chemistry; S-7 -crystallochemistry; S-8 - electrochemistry; S-9 - organic chemistry; S-10 -chemistry of polymers; S-11 - chemistry in medicine; S-12 - chemistry and technology of solid state materials; S-13 - young scientists forum; S-14 -didactics in chemistry; S-15 - theoretical chemistry; S-16 - environmental protection. Also the 3 microsymposia have been organized. It was: M-1 -chemistry of heteroorganic compounds; M-2 chromatography; M-3 - plasma chemistry.

  14. APPLICATION OF CHEMICAL PRE-TREATMENT ON THE POLISHED SURFACE OF ALUMINIUM ALLOYS

    Directory of Open Access Journals (Sweden)

    Pavel Kraus

    2016-12-01

    Full Text Available This paper reports the preparation and characterization of thin transparent nanolayers with phase composition ZrF4 and different modification of SiO2 with special focus on affecting the surface roughness of the material and the way of exclusion of the thin nanolayer on the surface of the polished aluminium material. The thin nanolayer was prepared by the sol-gel method. The final treatment based on PTFE was applied on the surface of some samples. This treatment is suitable for increasing wear resistance. The films were characterized with help of SEM microscopy and EDS analysis. The surface roughness was measured with classical surface roughness tester. The results on this theme have already published but not on the polished surface of the aluminium material. The results from the experiment show the problems with application of these nanolayers because a cracks were found on the surface of the material and deformations of the layer after application of the PTFE final layer. The surface layer formation is discussed.

  15. Polishing gold and gold-alloy crystals

    Science.gov (United States)

    Doty, J. P.

    1976-01-01

    Sawed cross-section samples are rough polished at minimum pressure with 14 micron grit. After saw marks are polished away, polishing grit is changed to 0.05 micron. When smooth appearance is attained, surface is then chemically polished by hand in dust free room.

  16. Planarization mechanism of alkaline copper CMP slurry based on chemical mechanical kinetics

    Science.gov (United States)

    Shengli, Wang; Kangda, Yin; Xiang, Li; Hongwei, Yue; Yunling, Liu

    2013-08-01

    The planarization mechanism of alkaline copper slurry is studied in the chemical mechanical polishing (CMP) process from the perspective of chemical mechanical kinetics. Different from the international dominant acidic copper slurry, the copper slurry used in this research adopted the way of alkaline technology based on complexation. According to the passivation property of copper in alkaline conditions, the protection of copper film at the concave position on a copper pattern wafer surface can be achieved without the corrosion inhibitors such as benzotriazole (BTA), by which the problems caused by BTA can be avoided. Through the experiments and theories research, the chemical mechanical kinetics theory of copper removal in alkaline CMP conditions was proposed. Based on the chemical mechanical kinetics theory, the planarization mechanism of alkaline copper slurry was established. In alkaline CMP conditions, the complexation reaction between chelating agent and copper ions needs to break through the reaction barrier. The kinetic energy at the concave position should be lower than the complexation reaction barrier, which is the key to achieve planarization.

  17. Planarization mechanism of alkaline copper CMP slurry based on chemical mechanical kinetics

    Institute of Scientific and Technical Information of China (English)

    Wang Shengli; Yin Kangda; Li Xiang; Yue Hongwei; Liu Yunling

    2013-01-01

    The planarization mechanism of alkaline copper slurry is studied in the chemical mechanical polishing (CMP) process from the perspective of chemical mechanical kinetics.Different from the international dominant acidic copper slurry,the copper slurry used in this research adopted the way of alkaline technology based on complexation.According to the passivation property of copper in alkaline conditions,the protection of copper film at the concave position on a copper pattern wafer surface can be achieved without the corrosion inhibitors such as benzotriazole (BTA),by which the problems caused by BTA can be avoided.Through the experiments and theories research,the chemical mechanical kinetics theory of copper removal in alkaline CMP conditions was proposed.Based on the chemical mechanical kinetics theory,the planarization mechanism of alkaline copper slurry was established.In alkaline CMP conditions,the complexation reaction between chelating agent and copper ions needs to break through the reaction barrier.The kinetic energy at the concave position should be lower than the complexation reaction barrier,which is the key to achieve planarization.

  18. Laser polishing of niobium for superconducting radio-frequency accelerator applications

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Liang [William and Mary College; Klopf, John M. [William and Mary College; Reece, Charles E. [JLAB; Kelley, Michael J. [JLAB

    2014-08-01

    Interior surfaces of niobium cavities used in superconducting radio frequency accelerators are now obtained by buffered chemical polish and/or electropolish. Laser polishing is a potential alternative, having advantages of speed, freedom from noxious chemistry and availability of in-process inspection. We studied the influence of the laser power density and laser beam raster rate on the surface topography. These two factors need to be combined carefully to smooth the surface without damage. Computational modeling was used to estimate the surface temperature and gain insight into the mechanism of laser polishing. Power spectral density analysis of surface topography measurements shows that laser polishing can produce smooth topography similar to that obtained by electropolish. This is a necessary first step toward introducing laser polishing as an alternative to the currently practiced chemical polishing.

  19. Application of Silicon Selective Epitaxial Growth and Chemo-Mechanical Polishing to Bipolar and Soi Mosfet Devices.

    Science.gov (United States)

    Nguyen, Cuong Tan

    1994-01-01

    Polished Epitaxy, or the combination of silicon Selective Epitaxial Growth and Chemo-Mechanical Polishing, provides new flexibility in process and device design, including optimized isolation, planar active-area definition, low-capacitance contacts, and SOI thin films. In this work, Polished Epitaxy has been developed with particular effort on overcoming junction leakage problems widely reported in devices fabricated in similar processes. It was found that in addition to careful surface preparation and defect control in the selective epitaxy process, issues such as sidewall orientation, junction passivation, crystal annealing, and surface damage removal were equally important and needed to be addressed. Coupled with the proper processing steps, Polished Epitaxy was able to deliver material of comparable quality to bulk silicon, suitable for device applications. By growing epitaxy laterally over an oxide step followed by polishing, a pedestal structure was created in which a thin film of single-crystal silicon was formed over oxide. Serving as the extrinsic base contact to a T-Pedestal bipolar transistor device, this pedestal helped minimize the parasitic extrinsic-base-collector overlap capacitance. The cut-off frequency (f_ {T}) in a device with a 1.0-mu m wide emitter stripe was found to improve from 17GHz to 22GHz when the contact overlap was reduced from a more conventional, larger size of 1.0 mu m to 0.2 mum. It is expected that the high-frequency performance of this structure can still be improved further in an optimized process with reduced emitter and collector resistances. The same pedestal structure was applied to a Pedestal -SOI (Silicon-On-Insulator) MOSFET device concept. At one extreme, a conventional bulk MOSFET structure is obtained when the pedestal is not utilized; quasi-SOI occurs when the drain and part of the channel overlap with the pedestal over buried oxide; at the other extreme, complete-SOI behavior results when source, channel, and drain

  20. Substrate preparation by contactless mechanochemical polish

    Science.gov (United States)

    Rotter, S.; Lachish, U.; El-Hanany, U.

    1985-10-01

    A simple, yet effective, polishing technique for substrate preparation is presented. It is contactless chemical polish which does not introduce any defects into the substrate during the process. The method can be readily adopted in all cases where chemical polishing is practical for substrate preparation. Results similar to those obtained by the more sophisticated hydroplaning method can be achieved.

  1. Buffer Chemical Polishing and RF Testing of the 56 MHz SRF Cavity

    Energy Technology Data Exchange (ETDEWEB)

    Burrill,A.

    2009-01-01

    The 56 MHz cavity presents a unique challenge in preparing it for RF testing prior to construction of the cryomodule. This challenge arises due to the physical dimensions and subsequent weight of the cavity, and is further complicated by the coaxial geometry, and the need to properly chemically etch and high pressure rinse the entire inner surface prior to RF testing. To the best of my knowledge, this is the largest all niobium SRF cavity to be chemically etched and subsequently tested in a vertical dewar at 4K, and these processes will be the topic of this technical note.

  2. Structural and chemical characteristics of atomically smooth GaN surfaces prepared by abrasive-free polishing with Pt catalyst

    Science.gov (United States)

    Murata, Junji; Sadakuni, Shun; Okamoto, Takeshi; Hattori, Azusa N.; Yagi, Keita; Sano, Yasuhisa; Arima, Kenta; Yamauchi, Kazuto

    2012-06-01

    This paper reports the structural and chemical characteristics of atomically flat gallium nitride (GaN) surfaces prepared by abrasive-free polishing with platinum (Pt) catalyst. Atomic force microscopy revealed regularly alternating wide and narrow terraces with a step height equivalent to that of a single bilayer on the flattened GaN surfaces, which originate from the differences in etching rate of two neighboring terraces. The material removal characteristics of the method for GaN surfaces were investigated in detail. We confirmed that an atomically smooth GaN surface with an extremely small number of surface defects, including pits and scratches, can be achieved, regardless of the growth method, surface polarity, and doping concentration. X-ray photoelectron spectroscopy showed that the flattening method produces clean GaN surfaces with only trace impurities such as Ga oxide and metallic Ga. Contamination with the Pt catalyst was also evaluated using total-reflection X-ray fluorescence analysis. A wet cleaning method with aqua regia is proposed, which markedly eliminates this Pt contamination without affecting the surface morphology.

  3. Fe-N{sub x}/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

    Energy Technology Data Exchange (ETDEWEB)

    Xu, Li, E-mail: xl0522@126.com [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Zou, Chunli; Shi, Xiaolei [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Pan, Guoshun, E-mail: pangs@tsinghua.edu.cn [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Luo, Guihai; Zhou, Yan [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China)

    2015-07-15

    Highlights: • A novel non-noble metal catalyst (Fe-N{sub x}/C) was prepared. • Fe-N{sub x}/C shows remarkable catalytic activity for improving the removal rate of sapphire in alkaline solution. • The optimum CMP removal by Fe-N{sub x}/C yielded a superior surface finish of 0.078 nm the average roughness. • Fe{sub 2}O{sub 3}, Fe{sub 3}O{sub 4}, pyridinic N as well as pyrrolic N group possibly serving as the catalytic sites. • A soft hydration layer (boehmite, AlO(OH)) was generated on the surface of sapphire during CMP process. - Abstract: In this paper, a novel non-noble metal catalyst (Fe-N{sub x}/C) is used to improve the removal mass of sapphire as well as obtain atomically smooth sapphire wafer surfaces. The results indicate that Fe-N{sub x}/C shows good catalytic activity towards sapphire removal rate. And the material removal rates (MRRs) are found to vary with the catalyst content in the polishing fluid. Especially that when the polishing slurry mixes with 16 ppm Fe-N{sub x}/C shows the maximum MRR and its removal mass of sapphire is 38.43 nm/min, more than 15.44% larger than traditional CMP using the colloidal silicon dioxide (SiO{sub 2}) without Fe-N{sub x}/C. Catalyst-assisted chemical–mechanical polishing of sapphire is studied with X-ray photoelectron spectroscopy (XPS). It is found that the formation of a soft hydration layer (boehmite, γ-AlOOH or γ-AlO(OH)) on sapphire surface facilitates the material removal and achieving fine surface finish on basal plane. Abrasives (colloid silica together with magnetite, ingredient of Fe-N{sub x}/C) with a hardness between boehmite and sapphire polish the c-plane of sapphire with good surface finish and efficient removal. Fe{sub 2}O{sub 3}, Fe{sub 3}O{sub 4}, pyridinic N as well as pyrrolic N group would be the catalytical active sites and accelerate this process. Surface quality is characterized with atomic force microscopy (AFM). The optimum CMP removal by Fe-N{sub x}/C also yields a superior

  4. Materials of jubilee scientific assembly of the Polish Chemical Society, Warsaw`94. Homo chemicus; Materialy z jubileuszowego zjazdu Polskiego Towarzystwa Chemicznego, Warszawa`94. Homo chemicus

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1994-12-31

    The Jubilee Scientific Assembly of the Polish Chemical Society has been held in 1994 in Warsaw. The general view on scientific progress in chemistry in Poland has been presented during plenary session. The conference has been divided into 15 sessions and 3 microsymposia covering the most important research fields in chemistry. Sessions topics were: analytical chemistry, chemistry of solid state materials, physical chemistry, coordination chemistry, medical chemistry, chemistry of metalorganic compounds, inorganic chemistry, organic chemistry, chemistry of polymers, young scientists forum, didactics and history of chemistry, catalysis, crystallochemistry, chemical technology, environment protection. Microsymposia`s topics were as follows: chemistry of saccharides, electrochemistry, membranes and membrane processes.

  5. The Family Meeting as a Mechanism of Family Governance: Review of the Experiences of Polish Family Companies

    Directory of Open Access Journals (Sweden)

    Izabela Koładkiewicz

    2014-09-01

    Full Text Available Purpose: The objective of the research was an assessment of the experiences of Polish owners of family companies in organizing family meetings as mechanisms of family governance as well as evaluating the usefulness of solutions developed in this sphere for both family and company. Methodology: The character of the conducted research was qualitative. The main technique used to gather data involved interviews. A total of thirty nine respondents from twenty companies were questioned. Nineteen were representatives of the older generation while twenty represented the younger second generation of owners of family businesses. Findings: Research results indicated the rather extensive use by the examined owner families of family meetings to discuss company matters. Depending on their needs, they developed various models ranging from the ad hoc bringing up of company matters to the transformation of such meetings into formal, family meetings of the management board organized in company offi ces. Regardless of organizational form, family meetings were an important forum for the exchange of information and views on the functioning of the company among family members. The experiences of the examined families of owners in building family governance systems, understood as a complex of structures and mechanisms making possible the maintenance of a balance between tensions stemming from economic and emotional ties among family members, both involved in the company and outside it, remain small. Research limitations: The qualitative character of the research, including the size of the examined sample (twenty family companies represented by thirty nine representatives, means that the generalizations made for the purposes of this study refer only to the experiences and opinions of the interviewed respondents. Originality: The research performed is the fi rst of its kind devoted to family meetings as a component of the system of family governance created in the

  6. Mechanism analysis on finishing of reaction-sintered silicon carbide by combination of water vapor plasma oxidation and ceria slurry polishing

    Science.gov (United States)

    Shen, Xinmin; Tu, Qunzhang; Deng, Hui; Jiang, Guoliang; Yamamura, Kazuya

    2015-05-01

    Reaction-sintered silicon carbide (RS-SiC), which is considered as a promising mirror material for space telescope systems, requires a high surface property. An ultrasmooth surface with a Ra surface roughness of 0.480 nm was obtained after water vapor plasma oxidation for 90 min followed by ceria slurry polishing for 40 min. The oxidation process of RS-SiC by water vapor plasma was analyzed based on the Deal-Grove model, and the theoretical calculation results are consistent with the measured data obtained by scanning white light interferometer (SWLI), scanning electron microscopy/energy-dispersive x-ray, and atomic force microscope. The polishing process of oxidized RS-SiC by ceria slurry was investigated according to the Preston equation, which would theoretically forecast the evolutions of RS-SiC surfaces along with the increasing of polishing time, and it was experimentally verified by comparing the surface roughnesses obtained by SWLI and the surface morphologies obtained by SEM. The mechanism analysis on the finishing of RS-SiC would be effective for the optimization of water vapor plasma oxidation parameters and ceria slurry polishing parameters, which will promote the application of RS-SiC substrates by improving the surface property obtained by the oxidation-assisted polishing method.

  7. A flexible nanobrush pad for the chemical mechanical planarization of Cu/ultra-low-к materials

    Science.gov (United States)

    Han, Guiquan; Liu, Yuhong; Lu, Xinchun; Luo, Jianbin

    2012-10-01

    A new idea of polishing pad called flexible nanobrush pad (FNP) has been proposed for the low down pressure chemical mechanical planarization (CMP) process of Cu/ultra-low-к materials. The FNP was designed with a surface layer of flexible brush-like nanofibers which can `actively' carry nanoscale abrasives in slurry independent of the down pressure. Better planarization performances including high material removal rate, good planarization, good polishing uniformity, and low defectivity are expected in the CMP process under the low down pressure with such kind of pad. The FNP can be made by template-assisted replication or template-based synthesis methods, which will be driven by the development of the preparation technologies for ordered nanostructure arrays. The present work would potentially provide a new solution for the Cu/ultra-low-к CMP process.

  8. Defectivity control of aluminum chemical mechanical planarization in replacement metal gate process of MOSFET

    Science.gov (United States)

    Jin, Zhang; Yuling, Liu; Chenqi, Yan; Yangang, He; Baohong, Gao

    2016-04-01

    The replacement metal gate (RMG) defectivity performance control is very challenging in high-k metal gate (HKMG) chemical mechanical polishing (CMP). In this study, three major defect types, including fall-on particles, micro-scratch and corrosion have been investigated. The research studied the effects of polishing pad, pressure, rotating speed, flow rate and post-CMP cleaning on the three kinds of defect, which finally eliminated the defects and achieved good surface morphology. This study will provide an important reference value for the future research of aluminum metal gate CMP. Project supported by the Major National Science and Technology Special Projects (No. 2009ZX02308), the Natural Science Foundation for the Youth of Hebei Province (Nos. F2012202094, F2015202267), and the Outstanding Youth Science and Technology Innovation Fund of Hebei University of Technology (No. 2013010).

  9. Materials of the yearly scientific assembly of the Polish Chemical Society - Torun`93: chemistry of new materials; Materialy z dorocznego zjazdu naukowego - Torun`93: chemia nowych materialow

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1993-12-31

    Scientific conference accompanied the assembly of Polish Chemical Society has been held in 1993 in Torun. The conference has been divided into 12 sections and 4 symposia covering the most important research fields in chemistry. The general view on scientific progress has been presented during the plenary session. Then proceedings have performed in specialist sessions on: contemporary methods in organic chemistry chemistry, chemistry and physico-chemistry of polymers, coordination chemistry state-of-the-art prospects, absorption and absorbents, new chemical technologies of organic compounds, new chemical technologies of inorganic compounds, environment protection, new methods in analytical chemistry, photochemistry and chemical kinetics, crystallochemistry, history of chemistry and didactics, new substances in health protection, membranes and membrane techniques, electroactive organic compounds, zeolites - material properties.

  10. Materials of yearly scientific assembly of Polish Chemical Society, Poznan 23-26 September 1996; Materialy ze zjazdu naukowego Polskiego Towarzystwa Chemicznego, Poznan 23-26 wrzesnia 1996

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1996-12-31

    The Scientific Assembly of Polish Chemical Society has been held in 1996 in Poznan. The general view on scientific progress of chemistry in Poland has been presented. The conference has been divided into 18 sessions covering the most important research fields in chemistry. The sessions topics were as follows: S-1 physical chemistry; S-2 photochemistry, radiation chemistry and chemical kinetics; S-3 catalysis; S-4 inorganic chemistry and coordination chemistry; S-5 organic chemistry; S-6 chemistry of hetero organic compounds; S-7 medical chemistry; S-8 crystallochemistry; S-9 environment protection; S-10 didactics in chemistry; S-11 analytical chemistry; S-12 chemical technology; S-13 chemical engineering; S-14 chemistry of polymers; S-15 young chemists forum; S-16 professor forum; S-17 membranes and membrane processes; S-18 supermolecular chemistry.

  11. Polish visit

    CERN Multimedia

    2003-01-01

    On 6 October, Professor Michal Kleiber, Polish Minister of Science and Chairman of the State Committee for Scientific Research, visited CERN and met both the current and designated Director General, Luciano Maiani and Robert Aymar. Professor Kleiber visited the CMS and ATLAS detector assembly halls, the underground cavern for ATLAS, and the LHC superconducting magnet string test hall. Michal Kleiber (left), Polish minister of science and Jan Krolikowski, scientist at Warsaw University and working for CMS, who shows the prototypes of the Muon Trigger board of CMS.

  12. A Finite Element Model for Wafer Materiall Removal Rate and Non-uniformity in Chemical Mechanical Polishing Process%机械化学抛光中晶圆材料切削率和非均匀性有限元模型

    Institute of Scientific and Technical Information of China (English)

    郭跃彬

    2001-01-01

    提出了一个机械化学抛光中晶圆材料非均匀性的有限元模型.通过分析压力、摩擦力、抛光垫和承载膜的可压缩性对晶圆的应力分布的影响,研究了抛光过程中晶圆厚度的不均匀性.结果证明非均匀剪应力是晶圆厚度变化的一个主要原因.这个模型也建立了声发射信号的变化和晶圆厚度不均匀性的关系.通过对晶圆材料切削率的声发射信号监测,证明了实验结果和模型预测值的一致性.%A 3D finite element model is presented for wafer non-uniformity in chemicalmechanical polishing(CMP)process. Film thickness non-uniformity of the wafer during CMPprocess was investigated by examining the influence of applied pressure, friction force,pad andcarrier film compressibility on stress distribution across the wafer diameter. It shows that non-uniform shear stress distribution on wafer plays an important role on the non-uniformity. Themodel relates the variation of acoustic emission (AE)signal from non-uniform stress distribu-tion on the wafer to its non-uniformity. The agreement between model prediction and experi-mental results is demonstrated by AE monitoring of material removal rate in CMP process.

  13. Characterization of implant materials in fetal bovine serum and sodium sulfate by electrochemical impedance spectroscopy. I. Mechanically polished samples.

    Science.gov (United States)

    Contu, F; Elsener, B; Böhni, H

    2002-12-01

    Electrochemical impedance spectroscopy is used to monitor the long-term stability (up to 150 days) of mechanically polished commercial pure titanium, Ti6Al4V, Ti6Al7Nb, and CoCrMo alloys in 0.1M sodium sulfate and fetal bovine serum. A capacitive spectrum in the frequency range from 10(-3) to 10(5) Hz is always found and the impedance spectra can be fitted by a simple parallel RC circuit with a constant phase element. The open circuit potential observed in serum is always more cathodic and the polarization resistance (R(p)) is higher than that recorded in sodium sulfate solutions. The observed variation of the equivalent capacitance in serum bovine suggests that an adsorption layer of organic molecules develops on the electrode surface and it is responsible for both the decrease in open circuit potential and the higher R(p), because it hinders the oxygen evolution reaction and the charge transfer responsible for the passive film dissolution (or growth). Among the alloys studied, Ti6Al4V displayed the highest steady-state values of R(p) both in serum and in sodium sulfate.

  14. POLISH FARM MACHINERY MARKET AFTER ACCESSION TO THE EUROPEAN UNION – PRODUCTION AND SUPPLY OF MEANS OF AGRICULTURAL MECHANIZATION

    Directory of Open Access Journals (Sweden)

    Jan Pawlak

    2014-09-01

    Full Text Available After accession to the EU in 2004 the demand for tractors and agricultural implements has grown, followed by increasing supply of them. In 2012, the supply of brand-new agricultural tractors was by 185.4% higher than in 2003. In 2012 the value of renovation index of tractor fleet in agriculture was by 149.3% higher than in 2003. In spite of significant increase of demand for tractors, their production in 2012 was by 39.2% lower than in 2003. The downfall in number of tractors produced in Poland caused that imported tractors achieved more and more important share in supplies on Polish market. In 2003 the share of imports amounted to 64.0% and in 2012 – 91.4%. Production of most other means of agricultural mechanization was in 2012 higher than in 2003. The increase in a case of manure spreaders amounted to 704.3%; self loading or unloading agricultural tractor trailers – 362.1%; fertilizer spreader – 335.2%; field sowing machines – 245.3%; pick-up balers – 222.1% and harvester threshers – 194.8. Decreases were noted in cases of steamers – by 73.3%; potato planters – by 49.7%; harrows other than disc ones – by 42.2%; potato diggers – by 31.2% and rototillers – by 22.8%.

  15. Ultrasonic Polishing

    Science.gov (United States)

    Gilmore, Randy

    1993-01-01

    The ultrasonic polishing process makes use of the high-frequency (ultrasonic) vibrations of an abradable tool which automatically conforms to the work piece and an abrasive slurry to finish surfaces and edges on complex, highly detailed, close tolerance cavities in materials from beryllium copper to carbide. Applications range from critical deburring of guidance system components to removing EDM recast layers from aircraft engine components to polishing molds for forming carbide cutting tool inserts or injection molding plastics. A variety of materials including tool steels, carbides, and even ceramics can be successfully processed. Since the abradable tool automatically conforms to the work piece geometry, the ultrasonic finishing method described offers a number of important benefits in finishing components with complex geometries.

  16. Evolution of the passive film on mechanically damaged nitinol.

    Science.gov (United States)

    Schroeder, Valeska

    2009-07-01

    The corrosion behavior of Nitinol-based medical implants is critical to their success in vivo. Contemporary Nitinol-based medical implants are typically chemically passivated or electrochemically polished to form a protective passive film. However, mechanically formed surfaces caused by handling damage, fretting, or fatigue fracture may also be present on a device in vivo. In this study, mechanically polished surfaces are used to simulate mechanically damaged surfaces such that analytical techniques, including electrochemical impedance spectroscopy, open circuit potential monitoring, X-ray photoelectron spectroscopy (XPS), and Mott-Schottky analysis may be used to monitor the evolution of the passive film on mechanically damaged Nitinol. These mechanically polished Nitinol surfaces are compared with chemically passivated and electrochemically polished Nitinol surfaces and mechanically polished titanium surfaces in phosphate buffered saline solution. The mechanically polished Nitinol exhibits lower impedance at low frequencies, empirically modeled to a thinner film with lower film resistance than chemically passivated and electrochemically polished Nitinol and mechanically polished titanium. Moreover, the passive film on mechanically polished Nitinol continues to develop over time, increasing in its thickness and film resistance. This characterization demonstrates that mechanically formed surfaces may be initially less protective than chemically passivated and electrochemically polished Nitinol surfaces, but continue to become thicker and more resistant to electrochemical reactions with exposure to saline solution.

  17. Experimental and Numerical Analysis of An Inhibitor-Containing Slurry for Copper Chemical Mechanical Planarization

    Science.gov (United States)

    Zhuang, Yun; Li, Zhonglin; Shimazu, Yoshitomo; Uotani, Nobuo; Borucki, Leonard; Philipossian, Ara

    2005-01-01

    A slurry containing Benzotriazole (BTA) as the inhibitor was analyzed in terms of its frictional, thermal and kinetic attributes for copper CMP applications. The frictional analysis indicated that ‘boundary lubrication’ was the dominant tribological mechanism. Due to the presence of the inhibitor in the slurry, copper removal rate exhibited a highly non-Prestonian behavior. Based on the measured coefficient of friction (\\mathit{COF}) and pad temperature data, a proven thermal model was used to predict wafer temperature. The Preston Equation was used to describe the polishing rate when p× V was lower than 11,000 Pa\\cdotm/s; while a modified Langmuir-Hinshelwood kinetic model was used to simulate the copper removal when p× V was higher than 11,555 Pa\\cdotm/s. Assuming that the adsorbed inhibitor layer was abraded off instantly from the copper surface when p× V was higher than 11,555 Pa\\cdotm/s, the modified Langmuir--Hinshelwood kinetic model indicated that copper polishing was chemically limited in this polishing region.

  18. Effect of slurry chemicals on chemical-mechanical planarization of copper

    Science.gov (United States)

    Hong, Youngki

    An important component of the slurries used in chemical mechanical planarization (CMP) is an appropriately chosen corrosion/dissolution inhibitor, which facilitates selective material removal from protrusions while protecting recessed regions of the surface. The present work demonstrates the utility of two environmentally benign anionic surfactants, sodium dodecyl sulfate (SDS) and ammonium dodecyl sulfate (ADS) as dissolution inhibitors. Using these surfactants in a standard slurry (1 wt% glycine with 5 wt% H2O 2 at pH = 4.0) typically used for Cu CMP, and combining measurements of open circuit potentials and contact angles with those of Cu removal rates, we show that both SDS and ADS suppress chemical dissolution and polish rates of Cu. The dissolution inhibition efficiencies of ADS and SDS measured in these experiments are found to be superior to those of benzotriazole (BTA), a traditional inhibiting agent used for copper CMP. It has been demonstrated that ADS can also be utilized as an inhibiting agent for the application in electrochemical-mechanical planarization (ECMP) of copper. Using an acidic electrolyte of glycine and H2O 2, and small Cu discs, we show that the corrosion inhibition efficiency of ADS is superior to that of benzotriazole even in ECMP application. The relation between PE of Cu patterns and complexing agents has been investigated by measuring removal rates and surface topographies from patterns created on blanket Cu films. It has been observed that PE is dependent on the step height and drops significantly beyond a threshold step height that is in the range of 1000 A. Since the same type of polishing pad (IC 1400) was used in all the experiments, it might be the complexing agent that determines this characteristic PE threshold. Also, the huge increase in Cu dissolution rate for the citric acid system with increasing temperature appears to be responsible for the low PE values measured for this system. The synergetic effect of mixtures of ADS

  19. EXPERIMENTAL AND MICRO-IMPACT MECHANISM OF GRINDING HEAD IN POLISHING MACHINE%抛光机磨头微观冲击机理与实验

    Institute of Scientific and Technical Information of China (English)

    邵俊鹏; 徐斌

    2012-01-01

    In order to investigate the microcosmic polishing mechanism ot grlnclmg neaa. Micro impact Mechanism of low/ high speed grinding head were derived. Mathematical modeling of microimpact and amplitude is established. It is concluded that the process of forming ceramic tile defects, by a series of SEM experiments of ceramic tiles. It is concluded that the micro-impact mechanism theory agreement with ceramic tile surface topography is obtained. A series of vibration experiments of grinding head is performed, low speed grinding head can help ceramic tile defects and it can considerably reduce the impact vibration of grinding head at the rough polishing; high speed grinding head so as to effectively enhance the tile surface smoothness at the finish polishing.%为了研究磨头微观加工机理,提出低、高速磨头微观冲击机理。建立微观冲击速度和振幅模型。通过SEM实验得出瓷砖微观缺陷形成过程,并验证了冲击机理理论符合瓷砖表面形貌。通过振动实验得出:粗抛阶段,低速磨头可以减少瓷砖缺陷,降低冲击振动;精抛阶段,高转速磨头可以提高瓷砖的表面质量。

  20. Phytochemical and physical-chemical analysis of Polish willow (Salix spp.) honey: identification of the marker compounds.

    Science.gov (United States)

    Jerković, Igor; Kuś, Piotr Marek; Tuberoso, Carlo Ignazio Giovanni; Šarolić, Mladenka

    2014-02-15

    The case study of Polish Salix spp. honey was compared with published data on willow honey from other regions. GC-FID/MS (after HS-SPME and ultrasonic solvent extraction) and targeted HPLC-DAD were applied. Phenolic content, FRAP/DPPH assays and the colour coordinates were determined spectrophotometrically. Beside ubiquitous linalool derivatives, borneol (up to 10.9%), bicyclic monoterpenes with pinane skeleton (pinocarvone up to 10.6%, myrtenal up to 4.8% and verbenone up to 3.4%) and trans-β-damascenone (up to 13.0%) dominated in the headspace. The main compounds of the extractives were vomifoliol (up to 39.6%) and methyl syringate (up to 16.5%) along with not common 4-hydroxy-3-(1-methylethyl)benzaldehyde (up to 11.1%). Abscisic acid (ABA) was found (up to 53.7 mg/kg) with the isomeric ratio (Z,E)-ABA:(E,E)-ABA=1:2. The honey exhibited low antioxidant potential with pale yellow colour. The composition of Polish willow honey is similar to Mediterranean willow honeys with several relevant differences.

  1. Dissolution, corrosion and environmental issues in chemical mechanical planarization of copper

    Science.gov (United States)

    Tamilmani, Subramanian

    Chemical mechanical polishing (CMP) of dielectric and metal films has become a key process in manufacturing devices with ultra large scale integration (ULSI). In a CMP process, planarization is achieved by polishing a wafer with uneven topography using colloidal slurry consisting of sub-micron sized abrasive particles, oxidant and various additives. Hydrogen peroxide and hydroxylamine are commonly used oxidants in copper CMP process. To achieve planarization, the low lying areas have to be protected while the higher areas are polished away. This requires low static dissolution rate of copper in low areas. Another major issue in copper CMP is galvanic corrosion during barrier polishing step where both copper and the barrier metal are exposed to the slurry. The main goal of the research reported in this dissertation is to understand the dissolution and corrosion issues during the removal of copper in hydroxylamine based chemistries. Electrochemical and physical methods such as profilometry were used to obtain copper removal rates. Among the variety of organic compound tested, benzotriazole and salicylhydroxamic acid were identified as potential corrosion inhibitors for copper. The passive film formed on the copper surface by the addition of benzotriazole and salicylhydroxamic acid was characterized by X-ray photoelectron spectroscopy and atomic force microscopy. The passivation and repassivation kinetics were investigated in detail and a passivation mechanism for copper in hydroxylamine in the presence of benzotriazole and salicylhydroxamic acid chemistries is proposed. Copper removal experiments were performed on a specially designed electrochemical abrasion cell (EC-AC) in the presence and absence of inhibitors. The effect of anodic potentials on the dissolution of copper in various chemistries was studied to identify suitable conditions for electro-chemical mechanical planarization process. The extent of galvanic corrosion between copper and tantalum was estimated

  2. Investigation on the Electrochemical-Mechanical Polishing of NiP Substrate of Hard Disk%硬盘NiP基板的电化学机械抛光研究

    Institute of Scientific and Technical Information of China (English)

    储向峰; 白林山; 陈同云

    2011-01-01

    利用自制的抛光液和改造的抛光机对NiP基板进行电化学机械抛光,研究了抛光电压、抛光台转速、抛光压力和抛光液流速对材料去除速率的影响,对电化学机械抛光的机理做了初步的分析.研究结果表明,NiP基板可以用低压力(3.5 kPa)抛光,材料的去除速率可以通过调整抛光电压,抛光台转速和抛光液流速进行控制.%NiP basic substrates of hard disks were polished by electrochemical-mechanical polishing (ECMP) method with home-made slurry and a modified polisher.The effects of voltage,table rotation speed,pressure and slurry flow rate on the removal rate were investigated.The electrochemical mechanical polishing mechanism was primarily analyzed.The results show that NiP substrate can be polished with ECMP method at low pressure (3.5 kPa) and the material removal rate (MRR) can be controlled by adjusting polishing voltage,rotation speed of polishing table and slurry flow rate.

  3. Benzotriazole as a passivating agent during chemical mechanical planarization of Ni–P alloy substrates

    Energy Technology Data Exchange (ETDEWEB)

    Mu, Yan; Zhong, Mingjie; Rushing, Kenneth J.; Li, Yuzhuo; Shipp, Devon A., E-mail: dshipp@clarkson.edu

    2014-10-01

    Highlights: • Benzotriazole (BTA) is used to passivate the Chemical Mechanical Planarization of Ni-P alloys. • BTA significantly decreases the average R{sub a} of the polished surfaces at low concentrations. • XPS, AFM and electrochemical studies are used to probe passivation effects of BTA on Ni–P surfaces. • Findings potentially impact hard disk drive manufacturing processes. - Abstract: With the rapid increase of data storage density on computer hard disk drives (HDDs), the operation distance between read/write head and disk surface has fallen to just a few nanometers. Chemical mechanical planarization (CMP) has been selected as the best process to produce high quality surface finish during the manufacturing of Ni–P alloy substrates for HDD applications. Herein we report, for the first time, the use of benzotriazole (BTA) as a passivating agent in CMP slurries to decrease the surface roughness (R{sub a}). Results show that the average R{sub a} of the polished surfaces is decreased to 0.2 nm in a 5 μm × 5 μm scan area with the adding of 2 mM BTA. X-ray photoelectron spectroscopy (XPS) and electrochemical studies results further prove the interaction between BTA and Ni–P surface and the formation of an effective passivating layer on Cu in CMP slurries containing BTA.

  4. Investigation of the chemical and electrochemical phenomena in the chemical mechanical planarization of copper

    Science.gov (United States)

    Wang, Ling

    Chemical mechanical planarization (CMP), a polishing process in which uneven surfaces of a copper film deposited on a wafer are planarized using chemically active slurry containing sub-micron abrasive particles, is key for the metallization of multilevel copper interconnection wires on integrated circuits by damascene processes. The present dissertation study investigates the electrochemical and chemical behavior of copper in aqueous solutions containing chemical reagents representative of those in CMP slurries, and the effects of these chemical constituents, with the aim of improving our understanding of the chemical processes responsible, at least in part, for planarization and material removal in copper CMP, and providing mechanistic and quantitative information for developing comprehensive predictive CMP removal models that incorporate chemical, electrochemical and mechanical factors. In the first part of the dissertation, the passivation behavior of copper in solutions containing hydrogen peroxide and glycine was examined, using various characterization techniques including electrochemical polarization curve measurements, copper coupon exposure tests, and electrochemical quartz crystal microbalance measurements. Polarization curves were measured with a rotating disk copper electrode in glycine solution, in the presence and absence of hydrogen peroxide, to understand the role of hydrogen peroxide in the oxidative dissolution and passivation of copper. Weight loss and copper solubilization measurements were conducted by exposing copper coupons to glycine solutions containing hydrogen peroxide, with various concentrations, at different solution pHs, to characterize the development and degree of the peroxide-induced passivation of copper and to obtain the kinetics of copper dissolution, in order to gain insight into the passivation mechanisms of copper in the peroxide-glycine-based solutions. The Quartz Crystal Microbalance (QCM) measurements were conducted with

  5. Implications of Polishing Techniques in Quantitative X-Ray Microanalysis

    Science.gov (United States)

    Rémond, Guy; Nockolds, Clive; Phillips, Matthew; Roques-Carmes, Claude

    2002-01-01

    Specimen preparation using abrasives results in surface and subsurface mechanical (stresses, strains), geometrical (roughness), chemical (contaminants, reaction products) and physical modifications (structure, texture, lattice defects). The mechanisms involved in polishing with abrasives are presented to illustrate the effects of surface topography, surface and subsurface composition and induced lattice defects on the accuracy of quantitative x-ray microanalysis of mineral materials with the electron probe microanalyzer (EPMA). PMID:27446758

  6. Deposition and Characterization of Nanocrystalline Diamond Films on Mirror-Polished Si Substrate by Biased Enhanced Microwave Plasma Chemical Vapor Deposition

    Science.gov (United States)

    Soga, T.; Sharda, T.; Jimbo, T.; Umeno, M.

    Hard and smooth nanocrystalline diamond (NCD) thin films were deposited on polished silicon substrates by biased enhanced growth in microwave plasma chemical vapor deposition. The films deposited with varying the methane concentration and biasing voltage were characterized by Raman spectroscopy, nano-indenter, x-ray diffraction and atomic force microscopy. Stress in the films increases with decreasing methane concentration in the gas-phase and with increasing biasing. The adhesion between NCD film and Si substrate is very strong sustaining the compressive stress as high as high as 85 GPa. It was hypothesized that hydrogen content of the films and graphitic content of the films are responsible in generating stress. The hardness is well correlated with the Raman peak intensity ratio of NCD peak to G peak.

  7. Synergetic effect of organic cores and inorganic shells for core/shell structured composite abrasives for chemical mechanical planarization

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Yang, E-mail: cy.jpu@126.com [School of Materials Science and Engineering, Changzhou University, Changzhou, Jiangsu 213164 (China); Li, Zhina [School of Materials Science and Engineering, Changzhou University, Changzhou, Jiangsu 213164 (China); Miao, Naiming [School of Mechanical Engineering, Changzhou University, Changzhou, Jiangsu 213016 (China)

    2014-09-30

    Highlights: • The damage-free polishing mechanism of core/shell composite abrasive was explored. • The organic core is help to decrease surface roughness and mechanical damages. • The inorganic shell is in favor of improving material removal rate. • The enhanced CMP behavior is due to the synergistic effect between core and shell. - Abstract: Core/shell structured organic/inorganic composite microspheres has an important potential application in efficient and damage-free chemical mechanical planarization/polishing (CMP) as a kind of novel abrasive due to its uniform non-rigid mechanical property. However, the synergistic effect of material removal between organic cores and inorganic shells of composite abrasives is ambiguous. In this work, oxide-CMP performances of various slurries, containing polystyrene (PS) spheres, solid abrasives (SiO{sub 2} or CeO{sub 2}), mixed abrasives ((PS + SiO{sub 2}) or (PS + CeO{sub 2})), core/shell composites (PS/SiO{sub 2} or PS/CeO{sub 2}), were investigated by atomic force microscopy. Experiment results indicated that the surfaces polished by composite abrasives exhibited lower surface roughness, fewer scratches as well as lower topographical variations than those by other type of abrasives. The core/shell structure of composite abrasives plays an important role in improving CMP behavior. Moreover, the organic cores are mainly beneficial to decrease surface roughness and mechanical damages, and the inorganic shells are in favor of improving material removal rate.

  8. Thermal, chemical, and mechanical cookoff modeling

    Energy Technology Data Exchange (ETDEWEB)

    Hobbs, M.L.; Baer, M.R.; Gross, R.J.

    1994-08-01

    A Thermally Reactive, Elastic-plastic eXplosive code, TREX, has been developed to analyze coupled thermal, chemical and mechanical effects associated with cookoff simulation of confined or unconfined energetic materials. In confined systems, pressure buildup precedes thermal runaway, and unconfined energetic material expands to relieve high stress. The model was developed based on nucleation, decomposition chemistry, and elastic/plastic mechanical behavior of a material with a distribution of internal defects represented as clusters of spherical inclusions. A local force balance, with mass continuity constraints, forms the basis of the model requiring input of temperature and reacted gas fraction. This constitutive material model has been incorporated into a quasistatic mechanics code SANTOS as a material module which predicts stress history associated with a given strain history. The thermal-chemical solver XCHEM has been coupled to SANTOS to provide temperature and reacted gas fraction. Predicted spatial history variables include temperature, chemical species, solid/gas pressure, solid/gas density, local yield stress, and gas volume fraction. One-Dimensional Time to explosion (ODTX) experiments for TATB and PBX 9404 (HMX and NC) are simulated using global multistep kinetic mechanisms and the reactive elastic-plastic constitutive model. Pressure explosions, rather than thermal runaway, result in modeling slow cookoff experiments of confined conventional energetic materials such as TATB. For PBX 9404, pressure explosions also occur at fast cookoff conditions because of low temperature reactions of nitrocellulose resulting in substantial pressurization. A demonstrative calculation is also presented for reactive heat flow in a hollow, propellant-filled, stainless steel cylinder, representing a rocket motor. This example simulation show

  9. Environment-friendly Chemical Polishing Technology of BFe10-1-1 Copper Alloy%绿色环保型BFe10-1-1铁白铜化学抛光工艺研究

    Institute of Scientific and Technical Information of China (English)

    黄俊学; 张晖; 杨锦瑜

    2011-01-01

    Taking H2O2 as main oxidant, the process of environment-friendly chemical polishing of Bfel 0-1-1 copper alloy was investigated. The influence of type of brightener, type of corrosion inhibitor, type of stabilizer of hydrogen peroxide, the polishing solution composition and polishing condition including polishing temperature and polishing time on the surface quality of the polished BFel0-1-1 copper alloy was discussed, and processing condition was optimized. The optimum composition of the chemical polishing solution for the BFelO-1-1 copper alloy was recommended to be composed of 350 mL/L hydrogen peroxide (30%) , 50 mL/L sulfuric acid, 17--20 mL/L ethyl alcohol, 1 mL/L OP-10, and 1 g/L 1,2,3-Benzotriazole, while the optimized polishing condition was suggested as temperature about 50 ℃ and polishing time 3~5 min.%研究以H2O2为主要氧化剂的化学抛光液对BFe10-1-1铁白铜进行表面化学抛光,考察了光亮剂、缓蚀剂、H2O2稳定剂的种类,化学抛光液各组分的含量,抛光温度以及抛光时间对铜合金抛光效果的影响.优化出抛光液组成及抛光工艺条件:质量分数为30%的H2O2 350 mL/L,浓H2SO450 mL/L,无水乙醇17~20mL/L,OP-10 1 mL/L,苯骈三氮唑(BTA)1 g/L,水余量;在50℃下抛光3~5 min.

  10. BFe30-1-1铜合金的化学抛光工艺研究%Chemical polishing technology of BFe30-1-1 copper alloy

    Institute of Scientific and Technical Information of China (English)

    张晖

    2011-01-01

    The process of chemical polishing of BFe30-l-l copper alloy with nitric acid was investigated. The influence of type of brightener, type of corrosion inhibitor, the polishing solution composition and polishing condition including polishing temperature and polishing time on the surface quality of the polished BFe30-l-l copper alloy was discussed, and processing condition was optimized. The optimum composition of the chemical polishing solution for the BFe30-l -1 copper alloy was 350 ~ 450 mL/L sulfuric acid, 3 ~5 mL/L hydrochloric acid,30 ~40 mL/L nitric acid,2 ~4 mL/L polyoxyethylene octylphenol ether, and 3 g/L benzotriazole, while the optimized polishing conditions were temperature 30℃ and polishing time 3 ~ 5 min.%研究以含硝酸的化学抛光液对BFe30-1-1铜合金进行化学抛光的方法,考察光亮剂的种类、缓蚀剂的种类、化学抛光液各组分的含量、抛光温度以及抛光时间对铜合金抛光效果的影响.结果表明,在实验范围内优化工艺条件为:350~450mL/L H2SO4,3~5 mL/L HCl,30 ~40 mL/L HNO3,2~4 mL/L辛基酚聚氧乙烯醚(OP-10),3 g/L苯骈三氮唑(BTA),水余量,抛光温度30℃左右,抛光时间3~5 min.在此工艺条件下对BFe30-1-1铜合金进行化学抛光,可以获得较好的抛光效果.

  11. Mechanical and Chemical Signaling in Angiogenesis

    CERN Document Server

    2013-01-01

    This volume of Studies in Mechanobiology, Tissue Engineering and Biomaterials describes the most recent advances in angiogenesis research at all biological length scales: molecular, cellular and tissue, in both in vivo and in vitro settings.  Angiogenesis experts from diverse fields including engineering, cell and developmental biology, and chemistry have contributed chapters which focus on the mechanical and chemical signals which affect and promote blood vessel growth. Specific emphasis is given to novel methodologies and biomaterials that have been developed and applied to angiogenesis research. 

  12. Reaction Mechanism Generator: Automatic construction of chemical kinetic mechanisms

    Science.gov (United States)

    Gao, Connie W.; Allen, Joshua W.; Green, William H.; West, Richard H.

    2016-06-01

    Reaction Mechanism Generator (RMG) constructs kinetic models composed of elementary chemical reaction steps using a general understanding of how molecules react. Species thermochemistry is estimated through Benson group additivity and reaction rate coefficients are estimated using a database of known rate rules and reaction templates. At its core, RMG relies on two fundamental data structures: graphs and trees. Graphs are used to represent chemical structures, and trees are used to represent thermodynamic and kinetic data. Models are generated using a rate-based algorithm which excludes species from the model based on reaction fluxes. RMG can generate reaction mechanisms for species involving carbon, hydrogen, oxygen, sulfur, and nitrogen. It also has capabilities for estimating transport and solvation properties, and it automatically computes pressure-dependent rate coefficients and identifies chemically-activated reaction paths. RMG is an object-oriented program written in Python, which provides a stable, robust programming architecture for developing an extensible and modular code base with a large suite of unit tests. Computationally intensive functions are cythonized for speed improvements.

  13. Effect of pH and chemical mechanical planarization process conditions on the copper-benzotriazole complex formation

    Science.gov (United States)

    Cho, Byoung-Jun; Kim, Jin-Yong; Hamada, Satomi; Shima, Shohei; Park, Jin-Goo

    2016-06-01

    Benzotriazole (BTA) has been used to protect copper (Cu) from corrosion during Cu chemical mechanical planarization (CMP) processes. However, an undesirable Cu-BTA complex is deposited after Cu CMP processes and it should be completely removed at post-Cu CMP cleaning for next fabrication process. Therefore, it is very important to understand of Cu-BTA complex formation behavior for its applications such as Cu CMP and post-Cu CMP cleaning. The present study investigated the effect of pH and polisher conditions on the formation of Cu-BTA complex layers using electrochemical techniques (potentiodynamic polarization and electrochemical impedance spectroscopy) and the surface contact angle. The wettability was not a significant factor for the polishing interface, as no difference in the contact angles was observed for these processes. Both electrochemical techniques revealed that BTA had a unique advantage of long-term protection for Cu corrosion in an acidic condition (pH 3).

  14. 雾化施液抛光硅片位错的化学腐蚀形貌分析%Chemical Corrosion Morphology Analysis of Dislocations of Silicon Wafer Polished by Ultrasonic Atomization CMP

    Institute of Scientific and Technical Information of China (English)

    壮筱凯; 李庆忠

    2015-01-01

    目的:研究硅片经雾化施液抛光技术加工后存在的位错缺陷。方法应用化学腐蚀法、光学方法分析硅片不同部位的位错腐蚀形貌、位错密度及其分布,通过单因素实验研究雾化参数对位错形貌和位错密度的影响规律。在相同的工艺参数下,和传统抛光进行对比实验。结果雾化抛光硅片的平均位错密度为1.2×104/cm2,边沿处的位错密度小于其他区域。在相同的工艺参数下,雾化施液CMP的抛光液消耗量约为传统CMP的1/10,但硅片的位错腐蚀形貌和位错密度明显好于传统抛光,且蚀坑分布均匀分散,没有出现位错排等严重缺陷。通过增大雾化器的出雾量能有效改善硅片表层的位错缺陷。结论相对于传统抛光,雾化施液抛光技术能更加高效地去除硅片的位错缺陷。%ABSTRACT:Objective To study the dislocation defect of silicon wafer which was polished by ultrasonic atomization chemical me-chanical polishing ( CMP) . Methods The chemical etching method and optics method were used to analyze the morphology, densi-ty, and distribution of the dislocation etch pits. Besides, the influence of atomization quantity on the morphology and density of dis-location was studied by single factor experiment. Then comparative experiments were conducted with traditional CMP under the same conditions. Results The average dislocation density of the polished silicon wafer was about 1. 2×104/cm2 and the dislocation density in edge area was lower than other areas. Besides, the dislocation morphology and dislocation density of silicon wafer pol-ished by ultrasonic atomization CMP were obviously better than those treated by traditional CMP under the same conditions while thepolishing liquid consumption was about one tenth of traditional CMP. The dislocation etch pits distributed evenly and there were no serious flaws such as dislocation piles and so on. In addition to that, the dislocation defect could be

  15. Mechanization of hydraulic testing of chemical equipment

    Energy Technology Data Exchange (ETDEWEB)

    Bannikov, M.T.; Fridman, R.N.; Petrovnin, A.I.

    1982-09-01

    The Institute VNIIPTKhimmash has worked out a comprehensive list of equipment for testing for strength and tightness containers and heat exchangers with jackets, with mixers, also of individual parts and subassemblies for this equipment. Points out that in the test stands developed for hydraulic testing of vessels both individual and centralized recirculating water supply can be used. Concludes that a reduction in labor consumption in hydraulic testing and in servicing of all the equipment used, an increase in the mechanization of this kind of chemical equipment, and the solution of the problem of standardization not only with regard to dimensions and parameters, but also with regard to the makes and types of the materials used, will make possible a considerable increase in labor productivity and product quality.

  16. Benzotriazole as a passivating agent during chemical mechanical planarization of Ni-P alloy substrates

    Science.gov (United States)

    Mu, Yan; Zhong, Mingjie; Rushing, Kenneth J.; Li, Yuzhuo; Shipp, Devon A.

    2014-10-01

    With the rapid increase of data storage density on computer hard disk drives (HDDs), the operation distance between read/write head and disk surface has fallen to just a few nanometers. Chemical mechanical planarization (CMP) has been selected as the best process to produce high quality surface finish during the manufacturing of Ni-P alloy substrates for HDD applications. Herein we report, for the first time, the use of benzotriazole (BTA) as a passivating agent in CMP slurries to decrease the surface roughness (Ra). Results show that the average Ra of the polished surfaces is decreased to 0.2 nm in a 5 μm × 5 μm scan area with the adding of 2 mM BTA. X-ray photoelectron spectroscopy (XPS) and electrochemical studies results further prove the interaction between BTA and Ni-P surface and the formation of an effective passivating layer on Cu in CMP slurries containing BTA.

  17. An advanced alkaline slurry for barrier chemical mechanical planarization on patterned wafers

    Institute of Scientific and Technical Information of China (English)

    Wang Chenwei; Liu Yuling; Niu Xinhuan; Tian Jianying; Gao Baohong; Zhang Xiaoqiang

    2012-01-01

    We have developed an alkaline barrier slurry (named FA/O slurry) for barrier removal and evaluated its chemical mechanical planarization (CMP) performance through comparison with a commercially developed barrier slurry.The FA/O slurry consists of colloidal silica,which is a complexing and an oxidizing agent,and does not have any inhibitors.It was found that the surface roughness of copper blanket wafers polished by the FA/O slurry was lower than the commercial barrier slurry,demonstrating that it leads to a better surface quality.In addition,the dishing and electrical tests also showed that the patterned wafers have a lower dishing value and sheet resistance as compared to the commercial barrier slurry.By comparison,the FA/O slurry demonstrates good planarization performance and can be used for barrier CMP.

  18. Chemical Mechanism Solvers in Air Quality Models

    Directory of Open Access Journals (Sweden)

    John C. Linford

    2011-09-01

    Full Text Available The solution of chemical kinetics is one of the most computationally intensivetasks in atmospheric chemical transport simulations. Due to the stiff nature of the system,implicit time stepping algorithms which repeatedly solve linear systems of equations arenecessary. This paper reviews the issues and challenges associated with the construction ofefficient chemical solvers, discusses several families of algorithms, presents strategies forincreasing computational efficiency, and gives insight into implementing chemical solverson accelerated computer architectures.

  19. Learning the mechanisms of chemical disequilibria

    Science.gov (United States)

    Nicholson, Schuyler B.; Alaghemandi, Mohammad; Green, Jason R.

    2016-08-01

    When at equilibrium, large-scale systems obey thermodynamics because they have microscopic configurations that are typical. "Typical" states are a fraction of those possible with the majority of the probability. A more precise definition of typical states underlies the transmission, coding, and compression of information. However, this definition does not apply to natural systems that are transiently away from equilibrium. Here, we introduce a variational measure of typicality and apply it to atomistic simulations of a model for hydrogen oxidation. While a gaseous mixture of hydrogen and oxygen combusts, reactant molecules transform through a variety of ephemeral species en route to the product, water. Out of the exponentially growing number of possible sequences of chemical species, we find that greater than 95% of the probability concentrates in less than 1% of the possible sequences. Overall, these results extend the notion of typicality across the nonequilibrium regime and suggest that typical sequences are a route to learning mechanisms from experimental measurements. They also open up the possibility of constructing ensembles for computing the macroscopic observables of systems out of equilibrium.

  20. DISPERSION OF NANODIAMOND AND ULTRA-FINE POLISHING OF QUARTZ WAFER

    Institute of Scientific and Technical Information of China (English)

    Yongwei Zhu; Zhijing Feng; Baichun Wang; Xianyang Xu

    2004-01-01

    Mechanochemical Modification (MCM) of nanodiamond surface with DN-10 was studied in relation to the performance of nanodiamond in polishing quartz wafers. Results show that the modified nanodiamond is more stable in the pH range 8~11. A super smooth surface with an average roughness of 0.214 nm was achieved using a nanodiamond-based slurry regulated by N-(2-hydroxyethyl)ethylenediamine. It is suggested that the principal ultra-fine polishing mechanism of quartz wafer involves atom-level removal under the synergism of chemical and mechanical actions.

  1. Mécanisme de l'usure par polissage des cylindres de moteurs diesel Bore Polishing Wear Mechanism in Diesel Engine Cylinders

    Directory of Open Access Journals (Sweden)

    Fayard J. C.

    2006-11-01

    particulier, l'usure des segments ainsi que les débits de gaz de soufflage, sont plus faibles qu'avec une chemise normale. Enfin, le mécanisme de l'usure par polissage par abrasion douce à deux et à trois corps est parfaitement confirmé par une exploration micrographique et une microanalyse des surfaces polies. A fast and economical method for evaluating lubricants and fuels in relation to the bore polishing wear of super charged diesel-engine cylinders has been developed using a single-cylinder laboratory engine within the framework of an Société Nationale Elf Aquitaine - Institut Français du Pétrole (SNEA-lFP research agreement. This method bears the reference IFP-UP-4/80.It also serves to evaluate the deposit-forming and sticking tendency, ring wear and the oil-consumption tendency of lubricants. It is in good correlation with the CEC-Ford Tornado test and makes an excellent discrimination between the Coordinating European Council (CEC reference cils RL 47 and RL 48. The method is used for investigating the bore polishingwear mechanism by searching for the influence exerted by the principal parameters: (a Composition of the lubricant: the phenomenon is influenced by the base oil and its viscosity, by the amount of polymers improving the viscosity index and especially by the choice of detergent additives. As a first approximation and for homogeneous oil familles, polishing wear increases when the thermal stability of the oil decreases. (b Engine running: polishing increases very fart with the engine load after a certain threshold, and its evolution in time as observed by endoscopic rating shows a characteristic S shape as polishing begins on the thrust side and at the top of the cylinder. (c Composition of the fuel: the increase in the sulfur content of diesel fuel considerably decreases polishing wear caused by an oil reputed to be poorfrom this standpoint but has no effect on a goodoil. (d Surface finish of the cylinder: prepolishing the liner by extremely fine

  2. Influence of Zn (II) ion on abrasive-free polishing of hard disk substrate

    Energy Technology Data Exchange (ETDEWEB)

    Lei, Hong, E-mail: hong_lei2005@163.com; Zhao, Rong, E-mail: zr890804@163.com; Chen, Ruling, E-mail: chen_ruling@163.com

    2014-07-01

    With higher requirement setting for hard disk substrate to minimize roughness and defects of the polished surface, abrasive-free polishing (AFP) of hard disk substrate has been put forward in this paper. The effect of Zn (II) ion on the AFP of hard disk substrate in the H{sub 2}O{sub 2} based slurry was investigated by AFP tests. The results indicate that the material removal rate of hard disk substrate polished in slurry with Zn (II) ion is obviously higher than that without Zn (II) ion. And surface polished by slurry containing Zn (II) ion exhibits lower surface roughness and fewer nano-asperity peaks than that without Zn (II) ion. Furthermore, the acting mechanism of Zn (II) ion in AFP of hard disk substrate was analyzed. X-ray photoelectron spectroscopy analysis shows that metal Zn appears on the polished surface, implying the tribochemistry reaction occurs during AFP. The electrochemical reaction between metal Zn and oxide film Ni{sub 2}O{sub 3} on the surface of hard disk substrate during AFP can promote the chemical effect in AFP and lead to the increasing of material removal rate. - Highlights: • Zn (II) ion improves surface quality in abrasive-free polishing (AFP). • The removal rate increases with the increasing of Zn (II) ion content. • Tribo-chemistry reaction exists during AFP. • Zn (II) ion accelerates the electrochemistry reaction during AFP.

  3. Optimization of Polishing Parameters with Taguchi Method for LBO Crystal in CMP

    Institute of Scientific and Technical Information of China (English)

    Jun Li; Yongwei Zhu; Dunwen Zuo; Yong Zhu; Chuangtian Chen

    2009-01-01

    Chemical mechanical polishing (CMP) was used to polish Lithium triborate (UB_3O_5 or LBO) crystal. Taguchi method was applied for optimization of the polishing parameters. Material removal rate (MRR) and surface roughness are considered as criteria for the optimization. The polishing pressure, the abrasive concentration and the table velocity are important parameters which influence MRR and surface roughness in CMP of LBO crystal. Experiment results indicate that for MRR the polishing pressure is the most significant polishing parameter followed by table velocity; while for the surface roughness, the abrasive concentration is the most important one. For high MRR in CMP of LBO crystal the optimal conditions are: pressure 620 g/cm~2, concentration 5.0 wt pct, and velocity 60 r/min, respectively. For the best surface roughness the optimal conditions are: pressure 416 g/cm~2, concentration 5.0 wt pct, and velocity 40 r/min, respectively. The contributions of individual parameters for MRR and surface roughness were obtained.

  4. Thyroid disrupting chemicals: Mechanisms and mixtures

    Science.gov (United States)

    Environmental contaminants are known to act as thyroid disrupting chemicals (TDCs). Broadly defined, TDCs are xenobiotics that alter the structure or function of the thyroid gland, alter regulatory enzymes associated with thyroid hormone (TH) homeostasis, or change circulating o...

  5. Tribo-chemical mechanisms of copper chemical mechanical planarization (CMP) - Fundamental investigations and integrated modeling

    Science.gov (United States)

    Tripathi, Shantanu

    In this work, copper Chemical Mechanical Planarization is identified primarily as a wear enhanced corrosion process (as opposed to the corrosion enhanced wear process assumed in existing modeling work), where intermittent abrasive action enhances the local oxidation rate, and is followed by time-dependant passivation of copper. Based on this mechanism, an integrated tribo-chemical model of material removal at the abrasive scale was developed based on oxidation of copper. This considers abrasive and pad properties, process parameters, and slurry chemistry. Three important components of this model -- the passivation kinetics of copper in CMP slurry chemicals; the mechanical properties of passive films on copper; and the interaction frequency of copper and abrasives -- are introduced. The first two components, in particular the passivation kinetics of copper, are extensively studied experimentally, while the third component is addressed theoretically. The passivation kinetics of copper (i.e. decrease in oxidation currents as passive films form on bare copper) were investigated by potential step chronoamperometry. Low cost microelectrodes were developed (first of its kind for studying copper CMP) to reduce many of the problems of traditional macroelectrodes, such as interference from capacitive charging, IR drops and low diffusion limited current. Electrochemical impedance spectroscopy (EIS) was used on copper microelectrodes in CMP slurry constituents to obtain equivalent circuit elements associated with different electrochemical phenomena (capacitive, kinetics, diffusion etc.) at different polarization potentials. The circuit elements were used to simulate chronoamperometry in a system where copper actively corrodes at anodic potentials; from the simulation and the experimental results, the current decay in this system was attributed entirely to capacitive charging. The circuit elements were also used to explain the chronoamperometry results in passivating and

  6. A model for chemically-induced mechanical loading on MEMS

    DEFF Research Database (Denmark)

    Amiot, Fabien

    2007-01-01

    The development of full displacement field measurements as an alternative to the optical lever technique to measure the mechanical response for microelectro-mechanical systems components in their environment calls for a modeling of chemically-induced mechanical fields (stress, strain, and displac......The development of full displacement field measurements as an alternative to the optical lever technique to measure the mechanical response for microelectro-mechanical systems components in their environment calls for a modeling of chemically-induced mechanical fields (stress, strain...

  7. Advanced ion exchange resins for PWR condensate polishing

    Energy Technology Data Exchange (ETDEWEB)

    Hoffman, B. [Rohm and Haas Co. (United States); Tsuzuki, S. [Rohm and Haas Co. (Japan)

    2002-07-01

    The severe chemical and mechanical requirements of a pressurized water reactor (PWR) condensate polishing plant (CPP) present a major challenge to the design of ion exchange resins. This paper describes the development and initial operating experience of improved cation and anion exchange resins that were specifically designed to meet PWR CPP needs. Although this paper focuses specifically on the ion exchange resins and their role in plant performance, it is also recognized and acknowledged that excellent mechanical design and operation of the CPP system are equally essential to obtaining good results. (authors)

  8. Chemical photoallergy: photobiochemical mechanisms, classification, and risk assessments.

    Science.gov (United States)

    Onoue, Satomi; Seto, Yoshiki; Sato, Hideyuki; Nishida, Hayato; Hirota, Morihiko; Ashikaga, Takao; Api, Anne Marie; Basketter, David; Tokura, Yoshiki

    2017-01-01

    Chemical photosensitivity can be elicited by exposure of the skin to various pharmaceutical substances, foods, cosmetics and other environmental chemicals, followed by exposure to sunlight. There are at least three types of chemical photosensitivity, i.e., photoirritancy (narrowly defined as phototoxicity), photogenotoxicity and photoallergenicity, and their clinical characteristics and mechanisms are quite different. Concerns about chemical photoallergy is increasing, and various studies have been made to clarify the photobiochemical characteristics of photoallergens and the mechanisms involved. Various methodologies, including in silico prediction models, photochemical assay systems, and in vitro phototoxicity prediction tools, have been developed to predict the photoallergenic potential of chemicals over the past few years. The aim of this manuscript is to review the clinical characteristics, pathogenetic mechanisms and photobiochemical features of photoallergens, with special emphasis on the current status about development of screening systems for predicting photoallergenic potential of chemicals.

  9. Physical Chemistry Chemical Kinetics and Reaction Mechanism

    CERN Document Server

    Trimm, Harold H

    2011-01-01

    Physical chemistry covers diverse topics, from biochemistry to materials properties to the development of quantum computers. Physical chemistry applies physics and math to problems that interest chemists, biologists, and engineers. Physical chemists use theoretical constructs and mathematical computations to understand chemical properties and describe the behavior of molecular and condensed matter. Their work involves manipulations of data as well as materials. Physical chemistry entails extensive work with sophisticated instrumentation and equipment as well as state-of-the-art computers. This

  10. Communicating in Polish.

    Science.gov (United States)

    Penny, Bernard; Malinowska, Krystyna T.

    This Polish textbook consists of a series of narrations and dialogs based on photographs depicting typical activities in the daily lives of Polish citizens. Two sets of questions follow each selection; the first set is intended to stimulate communication on what has been seen and heard, while the second set asks the students to compare what they…

  11. High polishing selectivity ceria slurry for formation of top electrode in spin-transfer torque magnetic random access memory

    Energy Technology Data Exchange (ETDEWEB)

    Cui, Hao [Advanced Semiconductor Materials and Devices Development Center, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Electronics and Communication Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Lim, Jae-Hyung [Advanced Semiconductor Materials and Devices Development Center, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Park, Jin-Hyung [Advanced Semiconductor Materials and Devices Development Center, Hanyang University, Seoul 133-791 (Korea, Republic of); Park, Jea-Gun, E-mail: parkjgL@hanyang.ac.kr [Advanced Semiconductor Materials and Devices Development Center, Hanyang University, Seoul 133-791 (Korea, Republic of); Department of Electronics and Communication Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)

    2012-11-01

    During the formation of the top electrode (T.E.) in spin-transfer torque magnetic random access memory, a slurry with a high polishing rate of SiO{sub 2} and a low polishing rate of metal (T.E. material) is required in the chemical mechanical planarization application area. We used a ceria-based slurry with a polymeric additive to maintain the high polishing rate of SiO{sub 2} while it suppresses the polishing rate of the T.E. material, tantalum and ruthenium. We found ruthenium showed a significantly higher selectivity than tantalum in the ceria-based slurry. X-ray photoelectron spectroscopy was used to investigate the adsorption characteristics of the polymeric additive on the T.E. material. Except for the adsorbed polymeric additive, we found that zeta potential of the T.E. material played a critical role in determining the polishing selectivity of SiO{sub 2}-to-T.E. material. - Highlights: Black-Right-Pointing-Pointer High selective chemical mechanical planarization (CMP) slurry was investigated. Black-Right-Pointing-Pointer The slurry has a high selectivity of SiO{sub 2}-to-metals like tantalum and ruthenium. Black-Right-Pointing-Pointer Spin-transfer-torque magnetic memory requires such high selectivity slurry. Black-Right-Pointing-Pointer Surface zeta potential was used to explain CMP mechanism. Black-Right-Pointing-Pointer tantalum and ruthenium have different rate-determining steps during CMP.

  12. The Application of Bileaflet Mechanical Heart Valves in the Polish Ventricular Assist Device: Physical and Numerical Study and First Clinical Usage.

    Science.gov (United States)

    Malota, Zbigniew; Sadowski, Wojciech; Krzyskow, Marek; Stolarzewicz, Bogdan

    2016-03-01

    The Polish ventricular assist device (Polvad) has been used successfully in clinical contexts for many years. The device contains two single-disc valves, one at the inlet and one at the outlet connector of the pneumatic pump. Unfortunately, in recent years, a problem has occurred with the availability of single-disc valves. This article presents the possibility of using bileaflet mechanical heart valve prostheses in the Polvad to avoid a discontinuity in clinical use. The study is based on experimental and numerical simulations and comparison of the distribution of flow, pressure, and stress (wall, shear, and turbulent) inside the Polvad chamber and the inlet/outlet connectors fitted with Sorin Monodisc and Sorin Bicarbon Fitline valves. The type and orientation of the inlet valve affects valve performance and flow distribution inside the chamber. Near-wall flow is observed for single-disc valves. In the case of bileaflet valves, the main jet is directed more centrally, with lower shear stress but higher turbulent stress in comparison with single-disc valves. For clinical usage, a 45° orientation of the bileaflet inlet valve was chosen, as this achieves good washing of the inlet area near the membrane paste surface. The Polvad with bileaflet valves has now been used successfully in our clinic for over a year and will continue to be used until new assist devices for heart support are developed.

  13. Micro-structural analysis of local damage introduced in subsurface regions of 4H-SiC wafers during chemo-mechanical polishing

    Science.gov (United States)

    Sako, Hideki; Matsuhata, Hirofumi; Sasaki, Masayuki; Nagaya, Masatake; Kido, Takanori; Kawata, Kenji; Kato, Tomohisa; Senzaki, Junji; Kitabatake, Makoto; Okumura, Hajime

    2016-04-01

    The surface morphology and lattice defect structures in the subsurface regions of 4H-SiC wafers introduced during chemo-mechanical polishing (CMP) were studied by scanning electron microscopy and transmission electron microscopy. It is known that local damage consisting of high-density lattice defects is introduced in the wafers during the current CMP, however, optical microscopy showed that the surface was very flat and clean without any presence of surface defects. Specifically, this study focused on the detailed analysis of such lattice defect structures. The high-density lattice defects locally introduced in the subsurface regions consisted of nano-scale surface scratches, high-density basal-plane dislocation loops, Shockley-type stacking faults, and Y-shaped defects. Two types of dislocation loops were introduced near the scratches that were selected for further study: nearly perfect basal-plane dislocations, which were accompanied by narrow stacking faults, and apparent partial basal-plane dislocations, which were accompanied by wide stacking faults. A Y-shaped defect was observed in the local damage along the [ 11 2 ¯ 0 ] direction, but not in the local damage along the [ 1 ¯100 ] direction. It was also found that the directions of the Burgers vectors for the basal-plane dislocations clearly depended on the directions of the introduced scratch-like defects.

  14. CHINESE RE POLISHING POWDER INDUSTRY

    Institute of Scientific and Technical Information of China (English)

    2005-01-01

    Due to its high polishing efficiency, long working life and wide application range, RE polishing powder has become the most popular fine polishing material. In recent years, accompanying the rapid development of electronic information technology, the demand for polishing powder is

  15. Buffered Electrochemical Polishing of Niobium

    Energy Technology Data Exchange (ETDEWEB)

    Ciovati, Gianluigi [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Tian, Hui [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); College of William and Mary, Williamsburg, VA (United States); Corcoran, Sean [Virginia Polytechnic Inst. and State Univ. (Virginia Tech), Blacksburg, VA (United States)

    2011-03-01

    The standard preparation of superconducting radio-frequency (SRF) cavities made of pure niobium include the removal of a 'damaged' surface layer, by buffered chemical polishing (BCP) or electropolishing (EP), after the cavities are formed. The performance of the cavities is characterized by a sharp degradation of the quality factor when the surface magnetic field exceeds about 90 mT, a phenomenon referred to as 'Q-drop.' In cavities made of polycrystalline fine grain (ASTM 5) niobium, the Q-drop can be significantly reduced by a low-temperature (? 120 °C) 'in-situ' baking of the cavity if the chemical treatment was EP rather than BCP. As part of the effort to understand this phenomenon, we investigated the effect of introducing a polarization potential during buffered chemical polishing, creating a process which is between the standard BCP and EP. While preliminary results on the application of this process to Nb cavities have been previously reported, in this contribution we focus on the characterization of this novel electrochemical process by measuring polarization curves, etching rates, surface finish, electrochemical impedance and the effects of temperature and electrolyte composition. In particular, it is shown that the anodic potential of Nb during BCP reduces the etching rate and improves the surface finish.

  16. Elastic emission polishing

    Energy Technology Data Exchange (ETDEWEB)

    Loewenthal, M.; Loseke, K.; Dow, T.A.; Scattergood, R.O.

    1988-12-01

    Elastic emission polishing, also called elastic emission machining (EEM), is a process where a stream of abrasive slurry is used to remove material from a substrate and produce damage free surfaces with controlled surface form. It is a noncontacting method utilizing a thick elasto-hydrodynamic film formed between a soft rotating ball and the workpiece to control the flow of the abrasive. An apparatus was built in the Center, which consists of a stationary spindle, a two-axis table for the workpiece, and a pump to circulate the working fluid. The process is controlled by a programmable computer numerical controller (CNC), which presently can operate the spindle speed and movement of the workpiece in one axis only. This apparatus has been used to determine material removal rates on different material samples as a function of time, utilizing zirconium oxide (ZrO{sub 2}) particles suspended in distilled water as the working fluid. By continuing a study of removal rates the process should become predictable, and thus create a new, effective, yet simple tool for ultra-precision mechanical machining of surfaces.

  17. The mechanical and chemical equations of motion of muscle contraction

    Science.gov (United States)

    Shiner, J. S.; Sieniutycz, Stanislaw

    1997-11-01

    Up to now no formulation of muscle contraction has provided both the chemical kinetic equations for the reactions responsible for the contraction and the mechanical equation of motion for the muscle. This has most likely been due to the lack of general formalisms for nonlinear systems with chemical-nonchemical coupling valid under the far from equilibrium conditions under which muscle operates physiologically. We have recently developed such formalisms and apply them here to the formulation of muscle contraction to obtain both the chemical and the mechanical equations. The standard formulation up to now has yielded only the dynamic equations for the chemical variables and has considered these to be functions of both time and an appropriate mechanical variable. The macroscopically observable quantities were then obtained by averaging over the mechanical variable. When attempting to derive the dynamics equations for both the chemistry and mechanics this choice of variables leads to conflicting results for the mechanical equation of motion when two different general formalisms are applied. The conflict can be resolved by choosing the variables such that both the chemical variables and the mechanical variables are considered to be functions of time alone. This adds one equation to the set of differential equations to be solved but is actually a simplification of the problem, since these equations are ordinary differential equations, not the partial differential equations of the now standard formulation, and since in this choice of variables the variables themselves are the macroscopic observables the procedure of averaging over the mechanical variable is eliminated. Furthermore, the parameters occurring in the equations at this level of description should be accessible to direct experimental determination.

  18. Role of interaction forces in controlling the stability and polishing performance of CMP slurries.

    Science.gov (United States)

    Basim, G Bahar; Vakarelski, Ivan U; Moudgil, Brij M

    2003-07-15

    Chemical mechanical polishing (CMP) is an essential step in metal and dielectric planarization in multilayer microelectronic device fabrication. In the CMP process it is necessary to minimize the extent of surface defect formation while maintaining good planarity and optimal material removal rates. These requirements are met through the control of chemical and mechanical interactions during the polishing process by engineering the slurry chemistry, particulate properties, and stability. In this study, the performance of surfactant-stabilized silica CMP slurries at high pH and high ionic strengths are investigated with particular emphasis on the particle-particle and particle-substrate interactions. It is shown that for the design of consistently high performing slurries, stability of abrasive particles must be achieved under the dynamic processing conditions of CMP while maintaining sufficient pad-particle-wafer interactions.

  19. The chemical, mechanical, and hydrological evolution of weathering granitoid

    Science.gov (United States)

    Goodfellow, Bradley W.; Hilley, George E.; Webb, Samuel M.; Sklar, Leonard S.; Moon, Seulgi; Olson, Christopher A.

    2016-08-01

    Surprisingly few studies connect the chemical, mechanical, and hydrological evolution of rock as it weathers to saprolite and soil. We assess this coevolution in granodiorite from Monterey Peninsula, California, by measuring changes in bulk chemistry, mineralogy, volumetric strain, the oxidation state of Fe in biotite crystals, tensile strength, abrasion rate, connected porosity, and hydraulic conductivity in samples covering a range of weathering grades. We identify the oxidative dissolution of biotite as the key chemical reaction because of the volumetric expansion that accompanies formation of altered biotite and precipitation of ferrihydrite. We show how the associated accumulation of elastic strain produces an energy density that is sufficient to support rock fracturing over length scales equivalent to constituent crystals. The resulting intragranular and intergranular cracking profoundly reduces tensile strength and increases the abrasion rate, connected porosity, and hydraulic conductivity of the rock matrix. These changes increase the rate of plagioclase weathering, and ultimately the rock disintegrates into grus and clay. Major changes in rock properties can occur with only minor element leaching, and the threshold behavior of weathering that arises from the coevolution of chemical, hydrological, and mechanical properties may be difficult to capture using simplified weathering models that fail to incorporate these properties. Our results, which combine the mechanical and hydrological evolution of weathering rock with more common measurements of chemical changes, should help to more accurately model the effects of, and mechanical and hydrological feedbacks upon, chemical weathering of rock.

  20. Origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid

    Institute of Scientific and Technical Information of China (English)

    Wang Liang-Yong; Liu Bo; Song Zhi-Tang; Liu Wei-Li; Feng Song-Lin; David Huang; S.V Babu

    2011-01-01

    We report on the investigation of the origin of high oxide to nitride polishing selectivity of ceria-based slurry in the presence of picolinic acid. The oxide to nitride removal selectivity of the ceria slurry with picolinic acid is as high as 76.6 in the chemical mechanical polishing. By using zeta potential analyzer, particle size analyzer, horizon profilometer, thermogravimetric analysis and Fourier transform infrared spectroscopy, the pre-and the post-polished wafer surfaces as well as the pre-and the post-used ceria-based slurries are compared. Possible mechanism of high oxide to nitride selectivity with using ceria-based slurry with picolinic acid is discussed.

  1. [The role of Wacława Moszyński in the development of the Polish School of Machine and Mechanism Theory].

    Science.gov (United States)

    Kisiel, Janusz; Pylak, Konrad; Schabowska, Krystyna

    2005-01-01

    The end of the 19th and the first half of the 20th centuries saw the emergence and intensive development of many disciplines in the technical sciences, and the laying of a groundwork for those disciplines in their current form. In Poland, a country deprived of independent statehood until 1918, this was additionally a period when native research centres and scientific schools came into being, and when Polish-language specialist literatures emerged as well. Many of the eminent personages whose activities contributed to those trends have already been described in biographical notes and articles. There are still, however, not enough studies dealing with the substance of their scientific and professional achievements. One of the personages in question was Wacława Moszyński, professor of the Warsaw Technical University, a pioneer of machine construction and mechanism theory, author of the first academic textbook in the field to be published in Poland. The current article discusses Moszyński's contribution to the development of mechanism and machine theory. The first part of the article gives an outline of the history of the discipline until 1945, presents the context of the after-war activities of the author, and evaluates his influence on the development of machine and mechanism theory in Poland; it also carries a short biography of Moszyński. The rest of the article is devoted to Moszyński's scientific achievements, and describes his approach to matters of structure, kinematics and dynamics, with special focus on those of his formulations and solution to problems that appear particularly innovative and original. The article also points out those proposals by Moszyński which made him a precursor of other disciplines, such as vibroacoustics, biomechanics and ergonomics. The paper also presents the role of Moszyński's work as a foundation for the development of the Warsaw research-and-teching centre in the field. The achievements and methods of the Warsaw school

  2. Development and Validation of Chemical Kinetic Mechanism Reduction Scheme for Large-Scale Mechanisms

    DEFF Research Database (Denmark)

    Poon, Hiew Mun; Ng, Hoon Kiat; Gan, Suyin

    2014-01-01

    This work is an extension to a previously reported work on chemical kinetic mechanism reduction scheme for large-scale mechanisms. Here, Perfectly Stirred Reactor (PSR) was added as a criterion of data source for mechanism reduction instead of using only auto-ignition condition. As a result, a re...

  3. DEMONSTRATION BULLETIN: COLLOID POLISHING FILTER METHOD - FILTER FLOW TECHNOLOGY, INC.

    Science.gov (United States)

    The Filter Flow Technology, Inc. (FFT) Colloid Polishing Filter Method (CPFM) was tested as a transportable, trailer mounted, system that uses sorption and chemical complexing phenomena to remove heavy metals and nontritium radionuclides from water. Contaminated waters can be pro...

  4. New ion exchange resin designs and regeneration procedures yield improved performance for various condensate polishing applications

    Energy Technology Data Exchange (ETDEWEB)

    Najmy, S.W. [Dow Chemical Co., Midland, MI (United States)

    2002-07-01

    Condensate polishing is an application with many different design and operational aspects. The past decade has brought new challenges for improved water quality with respect to both soluble and insoluble contaminants. Nonetheless, the endeavors to understand the compositional complexities of the ion exchange resin bead and the convoluted dynamics of ion exchange chemistry and chemical engineering mechanisms occurring within the mixed bed condensate polisher have brought new ideas and expectations for ion exchange resin in deep-bed condensate polishers than ever before. The new products and procedures presented here are a collaboration of a great deal of effort on the part of researchers, consultants, system engineers, station chemists, lab technicians and others. The studies discussed in this paper unequivocally demonstrate the merits of: 1. A specially designed cation resin to achieve greater than 95% insoluble iron removal efficiency, 2. A less-separable mixed resin for improved control of reactor water sulfate in BWR primary cycles, 3. Applying increased levels of regeneration chemicals and retrofitting the service vessels with re-mixing capability to improve the operation of deep-bed condensate polishers in PWR secondary cycles. (authors)

  5. Removal Of Optical Coatings Without Polishing

    Science.gov (United States)

    Gourley, Helen

    1980-11-01

    A process for removing antireflection, mirror and polarizer coatings has been developed at ILC, based on work begun by LLL (Applied Optics Vol. 17, No. 12, 15 June 1978 - "Notes on Optical Coating Removal", N.J. Brown). Because of the danger (personnel hazard) involved in the hydrofluoric acid process, we employed an ammonium bifluoride solution, combined with various polishing components. The substrates, generally BK7, are fairly soft and also sensitive to chemical action. Therefore we have limited our polishing materials to aluminum oxide powder graded at 0.1 pm or smaller. For some coatings, no polishing material is used, as the ammonium bifluoride solution is adequate to remove the coating. The resulting clean surface is washed and neutralized, and is then ready for recoating.

  6. Mechanism of known environmental teratogens: drugs and chemicals

    Energy Technology Data Exchange (ETDEWEB)

    Beckman, D.A.; Brent, R.L.

    1986-09-01

    Basic principles of teratology and mechanisms of teratogenesis applicable to human exposures to environmental drugs and chemicals are discussed. The available clinical and experimental animal literature on environmental agents alleged or known to cause human malformations is critically reviewed and summarized. 296 references.

  7. Quantum chemical investigation of mechanisms of silane oxidation

    DEFF Research Database (Denmark)

    Mader, Mary M.; Norrby, Per-Ola

    2001-01-01

    Several mechanisms for the peroxide oxidation of organosilanes to alcohols are compared by quantum chemical calculations, including solvation with the PCM method. Without doubt, the reaction proceeds via anionic, pentacoordinate silicate species, but a profound difference is found between in vacuo...

  8. The effect of mechanical load cycling and polishing time on microleakage of class V glass-ionomer and composite restorations: A scanning electron microscopy evaluation

    Directory of Open Access Journals (Sweden)

    Mansoreh Mirzaie

    2014-01-01

    Full Text Available Background: Microleakage is one of the challenging concerns in direct filling restorations. Understanding of its related factors is important in clinical practice. The aim of this study was scanning electron microscopy (SEM evaluation of marginal integrity in three types of tooth-colored restorative materials in class V cavity preparations and the effect of load cycling and polishing time on the microleakage. Materials and Methods: In this in vitro experimental study, class V cavity preparations were prepared on the buccal and lingual surfaces of 60 bovine incisors. The specimens were divided into three groups each containing 20 teeth: group 1: Filtek Z350, Group 2: Fuji IX/G Coat Plus, Group 3: Fuji II LC/GC varnish. In each group, 2 subgroups (n = 20 were established based on finishing time (immediate or delayed by 24 h. All specimens were thermocycled (×2,000, 5-50°C. In each sub groups, half of the teeth were load cycled. Epoxy resin replicas of 24 specimens were evaluated under field emission-SEM and interfacial gaps were measured. All teeth were then immersed in 0.5% basic fuchsin dye for 24 h, sectioned and observed under stereomicroscope. Data were analyzed with Kruskal-Wallis′ test and Mann-Whitney U test and a comparison between incisal and cervical microleakage was made with Wilcoxon test. P < 0.05 was considered as significant. Results: Load cycling and filling material had a significant effect on microleakage, but polishing time did not. Cervical microleakage in Z350/load cycle/immediate polish and Fuji IX/load cycle/immediate or delayed polish and Fuji IX/no load cycle/immediate polish were significantly higher than incisal microleakage. Conclusion: It was concluded that the cervical sealing ability of Fuji IX under load cycling was better than Fuji II LC. Under load cycling and immediate polishing Z350 showed better marginal integrity than both Fuji II LC and Fuji IX. The immediate polishing didn′t cause a statistically

  9. Modeling thermal/chemical/mechanical response of energetic materials

    Energy Technology Data Exchange (ETDEWEB)

    Baer, M.R.; Hobbs, M.L.; Gross, R.J. [and others

    1995-07-01

    An overview of modeling at Sandia National Laboratories is presented which describes coupled thermal, chemical and mechanical response of energetic materials. This modeling addresses cookoff scenarios for safety assessment studies in systems containing energetic materials. Foundation work is discussed which establishes a method for incorporating chemistry and mechanics into multidimensional analysis. Finite element analysis offers the capabilities to simultaneously resolve reactive heat transfer and structural mechanics in complex geometries. Nonlinear conduction heat transfer, with multiple step finite-rate chemistry, is resolved using a thermal finite element code. Rate equations are solved element-by-element using a modified matrix-free stiff solver This finite element software was developed for the simulation of systems requiring large numbers of finite elements. An iterative implicit scheme, based on the conjugate gradient method, is used and a hemi-cube algorithm is employed for the determination of view factors in surface-to-surface radiation transfer The critical link between the reactive heat transfer and mechanics is the introduction of an appropriate constitutive material model providing a stress-strain relationship for quasi-static mechanics analysis. This model is formally derived from bubble nucleation theory, and parameter variations of critical model parameters indicate that a small degree of decomposition leads to significant mechanical response. Coupled thermal/chemical/mechanical analysis is presented which simulates experiments designed to probe cookoff thermal-mechanical response of energetic materials.

  10. Functional Median Polish

    KAUST Repository

    Sun, Ying

    2012-08-03

    This article proposes functional median polish, an extension of univariate median polish, for one-way and two-way functional analysis of variance (ANOVA). The functional median polish estimates the functional grand effect and functional main factor effects based on functional medians in an additive functional ANOVA model assuming no interaction among factors. A functional rank test is used to assess whether the functional main factor effects are significant. The robustness of the functional median polish is demonstrated by comparing its performance with the traditional functional ANOVA fitted by means under different outlier models in simulation studies. The functional median polish is illustrated on various applications in climate science, including one-way and two-way ANOVA when functional data are either curves or images. Specifically, Canadian temperature data, U. S. precipitation observations and outputs of global and regional climate models are considered, which can facilitate the research on the close link between local climate and the occurrence or severity of some diseases and other threats to human health. © 2012 International Biometric Society.

  11. Homing orientation in salamanders: A mechanism involving chemical cues

    Science.gov (United States)

    Madison, D. M.

    1972-01-01

    A detailed description is given of experiments made to determine the senses and chemical cues used by salamanders for homing orientation. Sensory impairment and cue manipulative techniques were used in the investigation. All experiments were carried out at night. Results show that sense impaired animals did not home as readily as those who were blind but retained their sensory mechanism. This fact suggests that the olfactory mechanism is necessary for homing in the salamander. It was determined that after the impaired salamander regenerated its sensory mechanism it too returned home. It was concluded that homing ability in salamanders is direction independent, distant dependent, and vision independent.

  12. Environmentally clean slurry using nano-TiO{sub 2}-abrasive mixed with oxidizer H{sub 2}O{sub 2} for ruthenium-film chemical mechanical planarization

    Energy Technology Data Exchange (ETDEWEB)

    Cui, Hao [Department of Electronics and Communications Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Advance Semiconductor Material and Device Development Center, Hanyang University, Seoul 133-791 (Korea, Republic of); Park, Jin-Hyung [Advance Semiconductor Material and Device Development Center, Hanyang University, Seoul 133-791 (Korea, Republic of); Park, Jea-Gun, E-mail: parkjgL@hanyang.ac.kr [Department of Electronics and Communications Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of); Advance Semiconductor Material and Device Development Center, Hanyang University, Seoul 133-791 (Korea, Republic of)

    2013-10-01

    A colloidal silica-abrasive-based slurry mixed with periodate salts has been used for chemical mechanical planarization (CMP) of ruthenium (Ru) film in semiconductor-chip fabrication. This slurry has serious environmental problems such as generation of toxic RuO{sub 4} gas, corrosion, and ionic contamination. We developed an environmentally clean slurry using nano-TiO{sub 2} abrasive mixed with hydrogen peroxide (H{sub 2}O{sub 2}) for the purpose of Ru-film CMP. Moreover, this slurry is free of corrosion and ionic contamination. The polishing rates of Ru and SiO{sub 2} films with this slurry strongly depended on the H{sub 2}O{sub 2} concentration; the Ru-film polishing rate rapidly increased with H{sub 2}O{sub 2} concentration up to 1 wt% and then slightly decreased or saturated, whereas the SiO{sub 2}-film polishing rate abruptly dropped to ∼50 Å/min. In particular, the adsorbed amount of H{sub 2}O{sub 2} on nano-TiO{sub 2} abrasive directly determined the Ru-film polishing rate, indicating a new CMP mechanism of Ru film in the slurry.

  13. Chemical systems for electrochemical mechanical planarization of copper and tantalum films

    Science.gov (United States)

    Muthukumaran, Ashok Kumar

    Electro-Chemical Mechanical Planarization (ECMP) is a new and highly promising technology just reaching industrial application; investigation of chemistries, consumables, and tool/control approaches are needed to overcome technological limitations. Development of chemical formulations for ECMP presents several challenges. Unlike conventional CMP, formulations for ECMP may not need an oxidant. Organic additives, especially inhibitors used to control planarity (i.e. to protect recessed regions), need to be stable under applied anodic potential. To have a high current efficiency, the applied current should not induce decomposition of the formulations. In addition, to enable clearing of the copper film, the interactions between multiple exposed materials (barrier material as well as copper) must be considered. Development of a full sequence ECMP process would require the removal of the barrier layer as well. Chemical systems that exhibit a 1:1 selectivity between the barrier layer and copper would be ideal for the barrier removal step of ECMP. The main goal of this research is to investigate the chemistries suitable for ECMP of copper and tantalum films. Copper was electroplated onto the gold electrode of quartz crystals, and its dissolution/passivation behavior in hydroxylamine solutions was studied at different applied potential values. The dissolution rate of copper is pH dependent and exhibits a maximum in the vicinity of pH 6. Copper dissolution increases with respect to overpotential (eta) and dissolution rates as high as 6000 A/min have been obtained at overpotential of 750mV. While both benzotriazole (BTA) and salicylhydroxamic acid (SHA) serve as good inhibitors at lower overpotentials, their effectiveness decreases at higher overpotentials. A fundamental study was undertaken to evaluate the usefulness of a sulfonic acid based chemical system for the removal of tantalum under ECMP conditions. Tantalum as well as copper samples were polished at low pressures (

  14. Multi-functional composite materials for catalysis and chemical mechanical planarization

    Science.gov (United States)

    Coutinho, Cecil A.

    2009-12-01

    Composite materials formed from two or more functionally different materials offer a versatile avenue to create a tailored material with well defined traits. Within this dissertation research, multi-functional composites were synthesized based on organic and inorganic materials. The functionally of these composites was experimentally tested and a semi-empirical model describing the sedimentation behavior of these particles was developed. This first objective involved the fabrication of microcomposites consisting of titanium dioxide (TiO2) nanoparticles confined within porous, microgels of a thermo-responsive polymer for use in the photocatalytic treatment of wastewater. TiO2 has been shown to be an excellent photocatalyst with potential applications in advanced oxidative processes such as wastewater remediation. Upon UV irradiation, short-lived electron-hole pairs are generated, which produce oxidative species that degrade simple organic contaminants. The rapid sedimentation of these microcomposites provided an easy gravimetric separation after remediation. Methyl orange was used as a model organic contaminant to investigate the kinetics of photodegradation under a range of concentrations and pH conditions. Although after prolonged periods of UV irradiation (˜8-13 hrs), the titania-microgels also degrade, regeneration of the microcomposites was straightforward via the addition of polymer microgels with no loss in photocatalytic activity of the reformed microcomposites. The second objective within this dissertation involved the systematic development of abrasive microcomposite particles containing well dispersed nanoparticles of ceria in an organic/inorganic hybrid polymeric particle for use in chemical mechanical polishing/planarization (CMP). A challenge in IC fabrication involves the defect-free planarization of silicon oxide films for successful multi-layer deposition. Planarization studies conducted with the microcomposites prepared in this research, yield

  15. Oxalic acid based chemical systems for electrochemical mechanical planarization of copper

    Science.gov (United States)

    Lowalekar, Viral Pradeep

    In an ECMP process, a wafer is anodically baised during polishing. The electrical potential is the driving force to oxidize copper metal to ions. Copper ions then react with chemistry in the electrolyte to go in solution or form a passivation layer on the surface. The passivation layer is removed by a very low downforce (0.5--1 psi), causing copper to electrochemically dissolve in solution. Passive film formation during copper ECMP is key to the success of this process, since passivation reduces dissolution in the recessed areas, while elevations on the copper surface in direct contact with the ECMP pad are electrochemically planarized. If no passive film forms, then copper removal will be conformal from the elevated and recessed areas, and planarity will be lost. Chemical formulations for the electrochemical mechanical planarization (ECMP) of copper must contain constituents that are stable at anodic potentials. A key component of the formulation is a corrosion inhibitor, which is required to protect low lying areas while higher areas are selectively removed. Organic compounds, which adsorb on copper at low overpotentials and form a film by oxidation at higher overpotentials, may be particularly useful for ECMP. The main goal of the research reported in this dissertation is to understand and develop oxalic acid-based chemical systems suitable for ECMP of copper through electrochemical and surface investigations. Special attention was paid to the development of an inhibitor, which can function under applied potential conditions. Physical methods such as profilometry and four point probe were used to obtain copper removal rates. An organic compound, thiosalicylic acid (TSA), was identified and tested as a potential corrosion inhibitor for copper. TSA offers better protection than the conventionally used benzotriazole (BTA) by oxidizing at high anodic potentials to form a passive film on the copper surface. The passive film formed on the copper surface by addition of

  16. Performance analysis of CO2 laser polished angled ribbon fiber

    Science.gov (United States)

    Sohn, Ik-Bu; Choi, Hun-Kook; Noh, Young-Chul; Lee, Man-Seop; Oh, Jin-Kyoung; Kim, Seong-min; Ahsan, Md. Shamim

    2017-01-01

    This paper demonstrates CO2 laser assisted simultaneous polishing of angled ribbon fibers consisting eight set of optical fibers. The ribbon fibers were rotated vertically at an angle of 12° and polished by repetitive irradiation of CO2 laser beam at the end faces of the fibers. Compared to mechanically polished sharp edged angled fibers, CO2 laser polishing forms curve edged angled fibers. Increase in the curvature of the end faces of the ribbon fibers causes the increase of the fibers' strength, which in turn represents great robustness against fiber connections with other devices. The CO2 laser polished angled fibers have great smoothness throughout the polished area. The smoothness of the fiber end faces have been controlled by varying the number of laser irradiation. After CO2 laser polishing, the average value of the fiber angle of the ribbon fibers is ∼8.28°. The laser polished ribbon fibers show low insertion and return losses when connecting with commercial optical communication devices. The proposed technique of polishing the angled ribbon fibers is highly replicable and reliable and thus suitable for commercial applications.

  17. Friction Properties of Polished Cvd Diamond Films Sliding against Different Metals

    Science.gov (United States)

    Lin, Zichao; Sun, Fanghong; Shen, Bin

    2016-11-01

    Owing to their excellent mechanical and tribological properties, like the well-known extreme hardness, low coefficient of friction and high chemical inertness, chemical vapor deposition (CVD) diamond films have found applications as a hard coating for drawing dies. The surface roughness of the diamond films is one of the most important attributes to the drawing dies. In this paper, the effects of different surface roughnesses on the friction properties of diamond films have been experimentally studied. Diamond films were fabricated using hot filament CVD. The WC-Co (Co 6wt.%) drawing dies were used as substrates. A gas mixture of acetone and hydrogen gas was used as the feedstock gas. The CVD diamond films were polished using mechanical polishing. Polished diamond films with three different surface roughnesses, as well as the unpolished diamond film, were fabricated in order to study the tribological performance between the CVD diamond films and different metals with oil lubrication. The unpolished and polished CVD diamond films are characterized with scanning electron microscope (SEM), atomic force microscope (AFM), surface profilometer, Raman spectrum and X-ray diffraction (XRD). The friction examinations were carried out by using a ball-on-plate type reciprocating friction tester. Low carbide steel, stainless steel, copper and aluminum materials were used as counterpart balls. Based on this study, the results presented the friction coefficients between the polished CVD films and different metals. The friction tests demonstrate that the smooth surface finish of CVD diamond films is beneficial for reducing their friction coefficients. The diamond films exhibit low friction coefficients when slid against the stainless steel balls and low carbide steel ball, lower than that slid against copper ball and aluminum ball, attributed to the higher ductility of copper and aluminum causing larger amount of wear debris adhering to the sliding interface and higher adhesive

  18. Modulation of mechanical resonance by chemical potential oscillation in graphene

    Science.gov (United States)

    Chen, Changyao; Deshpande, Vikram V.; Koshino, Mikito; Lee, Sunwoo; Gondarenko, Alexander; MacDonald, Allan H.; Kim, Philip; Hone, James

    2016-03-01

    The classical picture of the force on a capacitor assumes a large density of electronic states, such that the electrochemical potential of charges added to the capacitor is given by the external electrostatic potential and the capacitance is determined purely by geometry. Here we consider capacitively driven motion of a nano-mechanical resonator with a low density of states, in which these assumptions can break down. We find three leading-order corrections to the classical picture: the first of which is a modulation in the static force due to variation in the internal chemical potential; the second and third are changes in the static force and dynamic spring constant due to the rate of change of chemical potential, expressed as the quantum (density of states) capacitance. As a demonstration, we study capacitively driven graphene mechanical resonators, where the chemical potential is modulated independently of the gate voltage using an applied magnetic field to manipulate the energy of electrons residing in discrete Landau levels. In these devices, we observe large periodic frequency shifts consistent with the three corrections to the classical picture. In devices with extremely low strain and disorder, the first correction term dominates and the resonant frequency closely follows the chemical potential. The theoretical model fits the data with only one adjustable parameter representing disorder-broadening of the Landau levels. The underlying electromechanical coupling mechanism is not limited by the particular choice of material, geometry, or mechanism for variation in the chemical potential, and can thus be extended to other low-dimensional systems.

  19. Chemical dynamics in the gas phase: Time-dependent quantum mechanics of chemical reactions

    Energy Technology Data Exchange (ETDEWEB)

    Gray, S.K. [Argonne National Laboratory, IL (United States)

    1993-12-01

    A major goal of this research is to obtain an understanding of the molecular reaction dynamics of three and four atom chemical reactions using numerically accurate quantum dynamics. This work involves: (i) the development and/or improvement of accurate quantum mechanical methods for the calculation and analysis of the properties of chemical reactions (e.g., rate constants and product distributions), and (ii) the determination of accurate dynamical results for selected chemical systems, which allow one to compare directly with experiment, determine the reliability of the underlying potential energy surfaces, and test the validity of approximate theories. This research emphasizes the use of recently developed time-dependent quantum mechanical methods, i.e. wave packet methods.

  20. Fluid Jet Polishing

    NARCIS (Netherlands)

    Booij, S.M.

    2003-01-01

    The goal of this thesis research was to investigate the possibilities and limitations of the Fluid Jet Polishing (FJP) technique. FJP is a new optical fabrication technique that is capable of making shape corrections and reducing the surface roughness of glass and other materials. The principle of o

  1. Nasalization in Polish

    Science.gov (United States)

    Rubach, Jerzy

    1977-01-01

    This paper gives a complete account of vowel nasalization in Standard Polish. A distinction is made between obligatory and phonostylistic processes. Phonostylistic evidence may serve as a basis for making unambiguous decisions about the structure of underlying representations, intermediate phonological forms, and assimilation of borrowings to the…

  2. Chemical reactions modulated by mechanical stress: extended Bell theory.

    Science.gov (United States)

    Konda, Sai Sriharsha M; Brantley, Johnathan N; Bielawski, Christopher W; Makarov, Dmitrii E

    2011-10-28

    A number of recent studies have shown that mechanical stress can significantly lower or raise the activation barrier of a chemical reaction. Within a common approximation due to Bell [Science 200, 618 (1978)], this barrier is linearly dependent on the applied force. A simple extension of Bell's theory that includes higher order corrections in the force predicts that the force-induced change in the activation energy will be given by -FΔR - ΔχF(2)∕2. Here, ΔR is the change of the distance between the atoms, at which the force F is applied, from the reactant to the transition state, and Δχ is the corresponding change in the mechanical compliance of the molecule. Application of this formula to the electrocyclic ring-opening of cis and trans 1,2-dimethylbenzocyclobutene shows that this extension of Bell's theory essentially recovers the force dependence of the barrier, while the original Bell formula exhibits significant errors. Because the extended Bell theory avoids explicit inclusion of the mechanical stress or strain in electronic structure calculations, it allows a computationally efficient characterization of the effect of mechanical forces on chemical processes. That is, the mechanical susceptibility of any reaction pathway is described in terms of two parameters, ΔR and Δχ, both readily computable at zero force.

  3. Electrochemical investigation of the surface-modifying roles of guanidine carbonate in chemical mechanical planarization of tantalum

    Energy Technology Data Exchange (ETDEWEB)

    Rock, S.E.; Crain, D.J.; Zheng, J.P. [Department of Physics, Clarkson University, Potsdam, NY 13699-5820 (United States); Pettit, C.M. [Department of Physics, Emporia State University, Emporia, KS 66801-5087 (United States); Roy, D., E-mail: samoy@clarkson.edu [Department of Physics, Clarkson University, Potsdam, NY 13699-5820 (United States)

    2011-10-03

    Highlights: {yields} This work contributes to the development of CMP slurries for Ta and Cu at low pressure. {yields} We present here a model of the chemical mechanism of the CMP of Ta and Cu using guanidine slurries. {yields} Removal of Ta occurs as structurally weak guanidinium-tantalic-acid surface complexes. {yields} The results will be useful for the CMP processing of interconnects with low-k dielectrics. {yields} We demonstrate the utility of electro-analytical techniques in the development of CMP slurries. - Abstract: The fabrication of interconnect structures for semiconductor devices requires low down-pressure chemical mechanical planarization (CMP) of Ta barrier layers. Guanidine carbonate (GC) serves as an effective surface-complexing agent for such CMP applications, where the rate of Ta removal can be chemically controlled through pH-tuned selectivity with respect to the removal of Cu lines. Electrochemical techniques are employed in this work to study the surface-modifying roles of GC that make this chemical an attractive complexing agent for Ta CMP. In addition, the effects of including H{sub 2}O{sub 2} (an oxidizer) and dodecyl benzene sulfonic acid (DBSA, a dissolution inhibitor for Cu) in GC-based CMP solutions are investigated to examine the selective CMP mechanisms of Ta and Cu in these solutions. The results suggest that the removal of Ta is supported in part by structurally weak guanidinium-tantalic-acid surface complexes formed on Ta/Ta{sub 2}O{sub 5}. The bicarbonate/carbonate anions of GC also facilitate Ta removal through the generation of ion-incorporated tantalum pentoxide. DBSA strongly affects the CMP chemistry of Cu, but exhibits relatively weaker effects on the surface activity of Ta, and thus plays a vital role in dictating the selectivity of Ta:Cu polish rates.

  4. A multipurpose reduced chemical-kinetic mechanism for methanol combustion

    Science.gov (United States)

    Fernández-Tarrazo, Eduardo; Sánchez-Sanz, Mario; Sánchez, Antonio L.; Williams, Forman A.

    2016-07-01

    A multipurpose reduced chemical-kinetic mechanism for methanol combustion comprising 8 overall reactions and 11 reacting chemical species is presented. The development starts by investigating the minimum set of elementary reactions needed to describe methanol combustion with reasonable accuracy over a range of conditions of temperature, pressure, and composition of interest in combustion. Starting from a 27-step mechanism that has been previously tested and found to give accurate predictions of ignition processes for these conditions, it is determined that the addition of 11 elementary reactions taken from its basis (San Diego) mechanism extends the validity of the description to premixed-flame propagation, strain-induced extinction of non-premixed flames, and equilibrium composition and temperatures, giving results that compare favourably with experimental measurements and also with computations using the 247-step detailed San Diego mechanism involving 50 reactive species. Specifically, premixed-flame propagation velocities and extinction strain rates for non-premixed counterflow flames calculated with the 38-step mechanism show departures from experimental measurements and detailed-chemistry computations that are roughly on the order of 10%, comparable with expected experimental uncertainties. Similar accuracy is found in comparisons of autoignition times over the range considered, except at very high temperatures, under which conditions the computations tend to overpredict induction times for all of the chemistry descriptions tested. From this 38-step mechanism, the simplification is continued by introducing steady-state approximations for the intermediate species CH3, CH4, HCO, CH3O, CH2OH, and O, leading to an 8-step reduced mechanism that provides satisfactory accuracy for all conditions tested. The flame computations indicate that thermal diffusion has a negligible influence on methanol combustion in all cases considered and that a mixture-average species

  5. Sexual activity of Polish adults

    Directory of Open Access Journals (Sweden)

    Beata Pastwa-Wojciechowska

    2014-03-01

    Full Text Available Aim. The purpose of this research was to explore the subject of sexual activity in the Polish population, with special focus on age and gender differences, and sexual infidelity. Sexual activity is one of the basic factors in initiating and maintaining relationships. On the one hand, sexual activity enables us to meet natural needs and maintain an intimate relationship with another human being; on the other, it may allow us to overcome loneliness and social isolation by providing the opportunity to express feelings of closeness and unity. Material and method. The research was conducted on a representative group of 3,200 Poles aged between 15–49, with the support of a well-known Polish research company – TNS OBOP. Face-to-face and Pencil and Paper (PAPI interviews were carried out. Results. The results focus on two main issues: the age and motives of sexual initiation among teenagers (with a significant percentage starting their sexual activity at the age of 15, and the quality of the sexual lives of adults (average number of sexual partners, sexual infidelity and sexual satisfaction. Conclusion. There is dependence between the type of relationship and the performance or non-performance of sexual activity, as well as the quality of the relationship. Among both adolescents and adults, remaining in a stable relationship (partnership or marriage promotes loyalty. The performance of sexual goals turns out to be an important mechanism regulating the interpersonal aspects of a relationship, influencing their perception and evaluation.

  6. MULTIDISCIPLINARY PROJECTS FOR SECOND YEAR CHEMICAL AND MECHANICAL ENGINEERING STUDENTS

    Directory of Open Access Journals (Sweden)

    MARWAN M. SHAMEL

    2013-04-01

    Full Text Available In the second semester of the second year of a Mechanical Engineering course, students are supposed to take a Module Outside the Main Discipline (MOMD. This module is chosen to be “Product Design Exercise” a module that is offered to Chemical Engineering students at the same stage. The aim was to expose students from both disciplines to an environment in which they are encouraged to interact with and engage team members with a relatively different background. The students were divided into eight groups all comprised of Chemical and Mechanical Engineering students, and they were offered different open-ended projects that were selected to exploit the knowledge developed by the students thus far and they were slightly skewed towards Chemical Engineering. The students demonstrated a high level of cooperation and motivation throughout the period of the project. Effective communication and closing of knowledge gaps were prevalent. At the end of the project period, students produced a journal paper in lieu of the project report.

  7. Polish device for FOCCoS/PFS slit system

    Science.gov (United States)

    de Oliveira, Antonio Cesar; de Oliveira, Ligia Souza; de Arruda, Marcio V.; Souza Marrara, Lucas; dos Santos, Leandro Henrique; Ferreira, Décio; dos Santos, Jesulino Bispo; de Paiva Vilaça, Rodrigo; Rosa, Josimar Aparecido; Sodré Junior, Laerte; de Oliveira, Claudia Mendes

    2014-07-01

    The Fiber Optical Cable and Connector System, "FOCCoS", for the Prime Focus Spectrograph, "PFS", is responsible for transporting light from the Subaru Telescope focal plane to a set of four spectrographs. Each spectrograph will be fed by a convex curved slit with 616 optical fibers organized in a linear arrangement. The slit frontal surface is covered with a special dark composite, made with refractory oxide, which is able to sustain its properties with minimum quantities of abrasives during the polishing process; this stability is obtained This stability is obtained by the detachment of the refractory oxide nanoparticles, which then gently reinforce gently the polishing process and increase its the efficiency. The surface roughness measured in several samples after high performance polishing was about 0.01 microns. Furthermore, the time for obtaining a polished surface with this quality is about 10 times less than the time required for polishing a brass, glass or ceramic surface of the same size. In this paper, we describe the procedure developed for high quality polishing of this type of slit. The cylindrical polishing described here, uses cylindrical concave metal bases on which glass paper is based. The polishing process consists to use grid sequences of 30μm, 12μm, 9μm, 5μm, 3μm, 1μm and, finally, a colloidal silica on a chemical cloth. To obtain the maximum throughput, the surface of the fibers should be polished in such a way that they are optically flat and free from scratches. The optical fibers are inspected with a microscope at all stages of the polishing process to ensure high quality. The efficiency of the process may be improved by using a cylindrical concave composite base as a substrate suitable for diamond liquid solutions. Despite this process being completely by hand, the final result shows a very high quality.

  8. Ultrasmooth surface polishing based on the hydrodynamic effect.

    Science.gov (United States)

    Peng, Wenqiang; Guan, Chaoliang; Li, Shengyi

    2013-09-01

    This study will examine the feasibility of applying the hydrodynamic effect to ultrasmooth surface polishing. Differing from conventional pad polishing, hydrodynamic effect polishing is noncontact, as the polishing wheel is floated on the workpiece under the hydrodynamic effect. The material removal mechanism and the removal contour are analyzed in detail. Dynamic pressure and shear stress distribution on the workpiece are numerically simulated in three dimensions under different clearances between the polishing wheel and the workpiece, showing that the dynamic pressure distribution and the magnitude of shear stress on the workpiece are greatly influenced by the clearance. It is clearly demonstrated from fixed-point polishing experiments that material removal rates and contours are determined by the combined action of dynamic pressure and shear stress. A material removal analytic model is presented with the hydrodynamic effect polishing method. Finally, a polishing experiment is conducted on a quartz glass and the plastic scratches, cracks, and bumpy structures on the initial surface are clearly removed. Moreover, the processed surface roughness is improved to 0.145 nm rms, 0.116 nm Ra.

  9. Computational thermal, chemical, fluid, and solid mechanics for geosystems management.

    Energy Technology Data Exchange (ETDEWEB)

    Davison, Scott; Alger, Nicholas; Turner, Daniel Zack; Subia, Samuel Ramirez; Carnes, Brian; Martinez, Mario J.; Notz, Patrick K.; Klise, Katherine A.; Stone, Charles Michael; Field, Richard V., Jr.; Newell, Pania; Jove-Colon, Carlos F.; Red-Horse, John Robert; Bishop, Joseph E.; Dewers, Thomas A.; Hopkins, Polly L.; Mesh, Mikhail; Bean, James E.; Moffat, Harry K.; Yoon, Hongkyu

    2011-09-01

    This document summarizes research performed under the SNL LDRD entitled - Computational Mechanics for Geosystems Management to Support the Energy and Natural Resources Mission. The main accomplishment was development of a foundational SNL capability for computational thermal, chemical, fluid, and solid mechanics analysis of geosystems. The code was developed within the SNL Sierra software system. This report summarizes the capabilities of the simulation code and the supporting research and development conducted under this LDRD. The main goal of this project was the development of a foundational capability for coupled thermal, hydrological, mechanical, chemical (THMC) simulation of heterogeneous geosystems utilizing massively parallel processing. To solve these complex issues, this project integrated research in numerical mathematics and algorithms for chemically reactive multiphase systems with computer science research in adaptive coupled solution control and framework architecture. This report summarizes and demonstrates the capabilities that were developed together with the supporting research underlying the models. Key accomplishments are: (1) General capability for modeling nonisothermal, multiphase, multicomponent flow in heterogeneous porous geologic materials; (2) General capability to model multiphase reactive transport of species in heterogeneous porous media; (3) Constitutive models for describing real, general geomaterials under multiphase conditions utilizing laboratory data; (4) General capability to couple nonisothermal reactive flow with geomechanics (THMC); (5) Phase behavior thermodynamics for the CO2-H2O-NaCl system. General implementation enables modeling of other fluid mixtures. Adaptive look-up tables enable thermodynamic capability to other simulators; (6) Capability for statistical modeling of heterogeneity in geologic materials; and (7) Simulator utilizes unstructured grids on parallel processing computers.

  10. Thermal, chemical, and mechanical response of rigid polyurethane foam

    Energy Technology Data Exchange (ETDEWEB)

    Hobbs, M.L.

    1997-12-01

    Rigid polyurethane foams are frequently used as encapsulants to isolate and support thermally sensitive components within weapon systems. When exposed to abnormal thermal environments, such as fire, the polyurethane foam decomposes to form products having a wide distribution of molecular weights and can dominate the overall thermal response of the system. Mechanical response of the decomposing foam, such as thermal expansion under various loading conditions created by gas generation, remains a major unsolved problem. A constitutive model of the reactive foam is needed to describe the coupling between mechanical response and chemical decomposition of foam exposed to environments such as fire. Towards this end, a reactive elastic-plastic constitutive model based on bubble mechanics describing nucleation, decomposition chemistry, and elastic/plastic mechanical behavior of rigid polyurethane foam has been developed. A local force balance, with mass continuity constraints, forms the basis of the constitutive model requiring input of temperature and the fraction of the material converted to gas. This constitutive model provides a stress-strain relationship which is applicable for a broad class of reacting materials such as explosives, propellants, pyrotechnics, and decomposing foams. The model is applied to a block of foam exposed to various thermal fluxes. The model is also applied to a sphere of foam confined in brass. The predicted mechanical deformation of the foam block and sphere are shown to qualitatively agree with experimental observations.

  11. Development of a hybrid chemical/mechanical heat pump

    Science.gov (United States)

    Grzyll, Lawrence R.; Silvestri, John J.; Scaringe, Robert P.

    1991-01-01

    The authors present the current development status of a hybrid chemical/mechanical heat pump for low-lift applications. The heat pump provides electronics cooling by evaporating a pure refrigerant from an absorbent/refrigerant mixture in a generator/cold plate. The current development focused on evaluation of absorbent/refrigerant pairs, corrosion testing, pump and compressor design, and electronic cold plate design. Two cycle configurations were considered. The first configuration utilized a standard mechanical compressor and pump. The second cycle configuration investigated pumps and compressors with non-moving parts. An innovative generator/cold plate design is also presented. The development to date shows that this cycle has about the same performance as standard vapor compression heat pumps with standard refrigerants but may have some performance and reliability advantages over vapor compression heat pumps.

  12. Influence of oxygen on the chemical stage of radiobiological mechanism

    Science.gov (United States)

    Barilla, Jiří; Lokajíček, Miloš V.; Pisaková, Hana; Simr, Pavel

    2016-07-01

    The simulation of the chemical stage of radiobiological mechanism may be very helpful in studying the radiobiological effect of ionizing radiation when the water radical clusters formed by the densely ionizing ends of primary or secondary charged particle may form DSBs damaging DNA molecules in living cells. It is possible to study not only the efficiency of individual radicals but also the influence of other species or radiomodifiers (mainly oxygen) being present in water medium during irradiation. The mathematical model based on Continuous Petri nets (proposed by us recently) will be described. It makes it possible to analyze two main processes running at the same time: chemical radical reactions and the diffusion of radical clusters formed during energy transfer. One may study the time change of radical concentrations due to the chemical reactions running during diffusion process. Some orientation results concerning the efficiency of individual radicals in DSB formation (in the case of Co60 radiation) will be presented; the influence of oxygen present in water medium during irradiation will be shown, too.

  13. Chemical and mechanical weed control in soybean (Glycine max

    Directory of Open Access Journals (Sweden)

    Weber, Jonas Felix

    2016-02-01

    Full Text Available In this study we investigated the possibility of chemical and mechanical weed control strategies in soybean. Soybean field experiments were carried out in 2013 and 2014 in Southern Germany. Five treatments including common herbicide mixtures and four mechanical weed control treatments, implementing a harrow and a hoe, were tested at different locations. In the herbicide experiments two treatments were applied by PRE emergence herbicides (metribuzin, clomazone, dimethenamid and metribuzin, flufenacet, clomazone and another two treatments were sprayed with a combination of PRE + POST emergence herbicides (metribuzin, flufenacet, thifensulfuron and pendimethalin, thifensulfuron, bentazone, cycloxydim. Furthermore, a POST herbicide treatment was implemented (thifensulfuron, bentazone, thifensulfuron and fluazifop-P-butyl. In the mechanical weed control experiments, treatments were: three times hoeing, PRE emergence harrowing plus three times hoeing, hoeing and harrowing in rotation or three times harrowing. In both experiments an untreated control was included. A 90% weed control efficacy and 23% yield increase was observed in the POST herbicide treatment. PRE + POST treatments resulted in 92% to 99% weed control efficiency and 15% yield increase compared to the untreated control. In the mechanical weed control experiments the combination of PRE emergence harrowing and POST emergence hoeing resulted in 82% weed control efficiency and 34% higher yield compared to the untreated control. Less weed control efficiency (72% was observed in the harrow treatment, leading to 20% higher yield compared to the control. The suitability of both strategies for implementation in “Integrated Weed Management” has been investigated.

  14. Detailed chemical kinetic oxidation mechanism for a biodiesel surrogate

    Energy Technology Data Exchange (ETDEWEB)

    Herbinet, O; Pitz, W J; Westbrook, C K

    2007-09-20

    A detailed chemical kinetic mechanism has been developed and used to study the oxidation of methyl decanoate, a surrogate for biodiesel fuels. This model has been built by following the rules established by Curran et al. for the oxidation of n-heptane and it includes all the reactions known to be pertinent to both low and high temperatures. Computed results have been compared with methyl decanoate experiments in an engine and oxidation of rapeseed oil methyl esters in a jet stirred reactor. An important feature of this mechanism is its ability to reproduce the early formation of carbon dioxide that is unique to biofuels and due to the presence of the ester group in the reactant. The model also predicts ignition delay times and OH profiles very close to observed values in shock tube experiments fueled by n-decane. These model capabilities indicate that large n-alkanes can be good surrogates for large methyl esters and biodiesel fuels to predict overall reactivity, but some kinetic details, including early CO{sub 2} production from biodiesel fuels, can be predicted only by a detailed kinetic mechanism for a true methyl ester fuel. The present methyl decanoate mechanism provides a realistic kinetic tool for simulation of biodiesel fuels.

  15. Detailed chemical kinetic oxidation mechanism for a biodiesel surrogate

    Energy Technology Data Exchange (ETDEWEB)

    Herbinet, O; Pitz, W J; Westbrook, C K

    2007-09-17

    A detailed chemical kinetic mechanism has been developed and used to study the oxidation of methyl decanoate, a surrogate for biodiesel fuels. This model has been built by following the rules established by Curran et al. for the oxidation of n-heptane and it includes all the reactions known to be pertinent to both low and high temperatures. Computed results have been compared with methyl decanoate experiments in an engine and oxidation of rapeseed oil methyl esters in a jet stirred reactor. An important feature of this mechanism is its ability to reproduce the early formation of carbon dioxide that is unique to biofuels and due to the presence of the ester group in the reactant. The model also predicts ignition delay times and OH profiles very close to observed values in shock tube experiments fueled by n-decane. These model capabilities indicate that large n-alkanes can be good surrogates for large methyl esters and biodiesel fuels to predict overall reactivity, but some kinetic details, including early CO2 production from biodiesel fuels, can be predicted only by a detailed kinetic mechanism for a true methyl ester fuel. The present methyl decanoate mechanism provides a realistic kinetic tool for simulation of biodiesel fuels.

  16. Exploring chemical reaction mechanisms through harmonic Fourier beads path optimization.

    Science.gov (United States)

    Khavrutskii, Ilja V; Smith, Jason B; Wallqvist, Anders

    2013-10-28

    Here, we apply the harmonic Fourier beads (HFB) path optimization method to study chemical reactions involving covalent bond breaking and forming on quantum mechanical (QM) and hybrid QM∕molecular mechanical (QM∕MM) potential energy surfaces. To improve efficiency of the path optimization on such computationally demanding potentials, we combined HFB with conjugate gradient (CG) optimization. The combined CG-HFB method was used to study two biologically relevant reactions, namely, L- to D-alanine amino acid inversion and alcohol acylation by amides. The optimized paths revealed several unexpected reaction steps in the gas phase. For example, on the B3LYP∕6-31G(d,p) potential, we found that alanine inversion proceeded via previously unknown intermediates, 2-iminopropane-1,1-diol and 3-amino-3-methyloxiran-2-ol. The CG-HFB method accurately located transition states, aiding in the interpretation of complex reaction mechanisms. Thus, on the B3LYP∕6-31G(d,p) potential, the gas phase activation barriers for the inversion and acylation reactions were 50.5 and 39.9 kcal∕mol, respectively. These barriers determine the spontaneous loss of amino acid chirality and cleavage of peptide bonds in proteins. We conclude that the combined CG-HFB method further advances QM and QM∕MM studies of reaction mechanisms.

  17. Temperature buffer test. Hydro-mechanical and chemical/ mineralogical characterizations

    Energy Technology Data Exchange (ETDEWEB)

    Aakesson, Mattias; Olsson, Siv; Dueck, Ann; Nilsson, Ulf; Karnland, Ola [Clay Technology AB, Lund (Sweden); Kiviranta, Leena; Kumpulainen, Sirpa [BandTech Oy, Helsinki (Finland); Linden, Johan [Aabo Akademi, Aabo (Finland)

    2012-01-15

    The Temperature Buffer Test (TBT) is a joint project between SKB/ANDRA and supported by ENRESA (modeling) and DBE (instrumentation), which aims at improving the understanding and to model the thermo-hydro-mechanical behavior of buffers made of swelling clay submitted to high temperatures (over 100 deg C) during the water saturation process. The test has been carried out in a KBS-3 deposition hole at Aspo HRL. It was installed during the spring of 2003. Two steel heaters (3 m long, 0.6 m diameter) and two buffer arrangements have been investigated: the lower heater was surrounded by rings of compacted Wyoming bentonite only, whereas the upper heater was surrounded by a composite barrier, with a sand shield between the heater and the bentonite. The test was dismantled and sampled during the winter of 2009/2010. This report presents the hydro-mechanical and chemical/mineralogical characterization program which was launched subsequent to the dismantling operation. The main goal has been to investigate if any significant differences could be observed between material from the field experiment and the reference material. The field samples were mainly taken from Ring 4 (located at the mid-section around the lower heater), in which the temperature in the innermost part reached 155 deg C. The following hydro-mechanical properties have been determined for the material (test technique within brackets): hydraulic conductivity (swelling pressure device), swelling pressure (swelling pressure device), unconfined compression strength (mechanical press), shear strength (triaxial cell) and retention properties (jar method). The following chemical/mineralogical properties (methods within brackets) were determined: anion analysis of water leachates (IC), chemical composition (ICP/AES+MS, EGA), cation exchange capacity (CEC, Cu-trien method) and exchangeable cations (exchange with NH4, ICPAES), mineralogical composition (XRD and FTIR), element distribution and microstructure (SEM and

  18. Centrifugal barrel polishing of 1.3 GHz Nb cavities

    Energy Technology Data Exchange (ETDEWEB)

    Tamashevich, Yegor; Foster, Brian [DESY, Hamburg (Germany); Hamburg Univ. (Germany); Navitski, Aliaksandr; Steder, Lea; Elsen, Eckhard [DESY, Hamburg (Germany)

    2013-07-01

    Superconducting radio-frequency (SRF) cavities are the key components of particle accelerators such as the European X-ray Free Electron Laser (XFEL, under construction) and the planned future International Linear Collider (ILC). Steady progress in surface treatment techniques of SRF cavities in both the achievable quality factor Q and the accelerating electric field Eacc makes new accelerators and ambitious projects feasible. One of the alternative surface preparation techniques which is actually being explored is centrifugal barrel polishing (CBP) pioneered at KEK in Japan in mid-nineties by T. Hiuchi et al. CBP is a mechanical polishing of cavities and results in around 10 x smaller surface roughness and mirror-like surface as compared to chemistry alone. Q and E{sub acc} are expected to be at least as high as for chemically treated cavities. CBP eliminates the bulk chemistry and has the potential to completely replace the chemistry. The University of Hamburg is installing a CBP machine to study it as a cavity preparation and repair technique for 9-cell 1.3 GHz SRF cavities at the Deutsche Elektronen-Synchrotron (DESY). The setup and first commissioning tests will be presented and discussed.

  19. Contrastive Analysis of Metatext. Expressing Polish "niemniej" in Bulgarian

    Directory of Open Access Journals (Sweden)

    Anna Katarzyna Kisiel

    2015-12-01

    Full Text Available Contrastive Analysis of Metatext. Expressing Polish niemniej in Bulgarian The author discusses possible ways of expressing meanings of Polish niemniej, tym niemniej and niemniej jednak in Bulgarian. A confrontative analysis of the equivalents gives grounds for a reflection on how to conduct a cross-linguistic examination of metatext. Two important questions are raised: whether it is methodologically justified to compare objects non-identical such as units and compositions, lexical and grammatical means, and what exactly equivalence within metatext class means. It is expected that analysis of metatext in Polish and Bulgarian will allow to discover mechanisms of creating metatextual units.

  20. Hydraulic supports for polishing TMT M3MP

    Science.gov (United States)

    Hu, Haifei; Qi, Erhui; Cole, Glen; Hu, Haixiang; Luo, Xiao; Ford, Virginia; Zhang, Xuejun

    2016-10-01

    For polishing the ultra-thin TMT M3MP, a polishing support system with 18 hydraulic supports (HS) is introduced. This work focuses on the designing and testing of these HSs. Firstly the design concept of HS system is discussed; then mechanical implementation of the HS structure is carried out, with special consideration of fluid cycling, work pressurization and the weight component. Afterward the piping installation and the de-gas process for the working fluid are implemented. Pressurization and stiffness are well checked before system integration for the single HS unit. Finally the support system is integrated for the polishing process.

  1. Surface polishing of niobium for superconducting radio frequency (SRF) cavity applications

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Liang [College of William and Mary, Williamsburg, VA (United States)

    2014-08-01

    Niobium cavities are important components in modern particle accelerators based on superconducting radio frequency (SRF) technology. The interior of SRF cavities are cleaned and polished in order to produce high accelerating field and low power dissipation on the cavity wall. Current polishing methods, buffered chemical polishing (BCP) and electro-polishing (EP), have their advantages and limitations. We seek to improve current methods and explore laser polishing (LP) as a greener alternative of chemical methods. The topography and removal rate of BCP at different conditions (duration, temperature, sample orientation, flow rate) was studied with optical microscopy, scanning electron microscopy (SEM), and electron backscatter diffraction (EBSD). Differential etching on different crystal orientations is the main contributor to fine grain niobium BCP topography, with gas evolution playing a secondary role. The surface of single crystal and bi-crystal niobium is smooth even after heavy BCP. The topography of fine grain niobium depends on total removal. The removal rate increases with temperature and surface acid flow rate within the rage of 0~20 °C, with chemical reaction being the possible dominate rate control mechanism. Surface flow helps to regulate temperature and avoid gas accumulation on the surface. The effect of surface flow rate on niobium EP was studied with optical microscopy, atomic force microscopy (AFM), and power spectral density (PSD) analysis. Within the range of 0~3.7 cm/s, no significant difference was found on the removal rate and the macro roughness. Possible improvement on the micro roughness with increased surface flow rate was observed. The effect of fluence and pulse accumulation on niobium topography during LP was studied with optical microscopy, SEM, AFM, and PSD analysis. Polishing on micro scale was achieved within fluence range of 0.57~0.90 J/cm2, with pulse accumulation adjusted accordingly. Larger area treatment was proved possible by

  2. Mechanism of plasma ignition in electrothermal-chemical launcher

    Directory of Open Access Journals (Sweden)

    Yong Jin

    2016-04-01

    Full Text Available Plasma generator is a core component in an electrothermal-chemical (ETC launcher. Its work state directly influences the launch efficiency of a system. The interaction between plasma and propellants is a very important mechanism in ETC technology. Based on the transient radiation model and open air plasma jet experiment, the mechanism of plasma ignition process is analyzed. Results show that the surface temperature of local solid propellant grain can quickly achieve the ignition temperature under the action of early transient plasma radiation. But it needs enough time to maintain the high energy flow to make self-sustained combustion of solid propellant grains. Because of the limited space characteristics of transient radiation, the near-field propellant grains can gain enough energy by the strong transient radiation to be ignited and achieve self-sustained combustion. The far-field propellant grains mainly gain the energy by the activated particles in plasma jet to be ignited and self-sustained combustion. Experiments show that plasma jet always has a high flow velocity in the area of the cartridge. Compared with conventional ignition, the solid propellant grains can obtain more quick and uniform ignition and self-sustained combustion by this kind of ablation controlled arc (ACA plasma via energy skin effect of propellant grains, pre-heat temperature mechanism and high efficient jet diffusion.

  3. Mechanism of plasma ignition in electrothermal-chemical launcher

    Institute of Scientific and Technical Information of China (English)

    Yong JIN; Yan-jie NI; Hai-yuan LI; Bao-ming LI

    2016-01-01

    Plasma generator is a core component in an electrothermal-chemical (ETC) launcher. Its work state directly influences the launch efficiency of a system. The interaction between plasma and propellants is a very important mechanism in ETC technology. Based on the transient radiation model and open air plasma jet experiment, the mechanism of plasma ignition process is analyzed. Results show that the surface temperature of local solid propellant grain can quickly achieve the ignition temperature under the action of early transient plasma radiation. But it needs enough time to maintain the high energy flow to make self-sustained combustion of solid propellant grains. Because of the limited space characteristics of transient radiation, the near-field propellant grains can gain enough energy by the strong transient radiation to be ignited and achieve self-sustained combustion. The far-field propellant grains mainly gain the energy by the activated particles in plasma jet to be ignited and self-sustained combustion. Experiments show that plasma jet always has a high flow velocity in the area of the cartridge. Compared with conventional ignition, the solid propellant grains can obtain more quick and uniform ignition and self-sustained combustion by this kind of ablation controlled arc (ACA) plasma via energy skin effect of propellant grains, pre-heat temperature mechanism and high efficient jet diffusion.

  4. Mathematically Reduced Chemical Reaction Mechanism Using Neural Networks

    Energy Technology Data Exchange (ETDEWEB)

    Ziaul Huque

    2007-08-31

    This is the final technical report for the project titled 'Mathematically Reduced Chemical Reaction Mechanism Using Neural Networks'. The aim of the project was to develop an efficient chemistry model for combustion simulations. The reduced chemistry model was developed mathematically without the need of having extensive knowledge of the chemistry involved. To aid in the development of the model, Neural Networks (NN) was used via a new network topology known as Non-linear Principal Components Analysis (NPCA). A commonly used Multilayer Perceptron Neural Network (MLP-NN) was modified to implement NPCA-NN. The training rate of NPCA-NN was improved with the GEneralized Regression Neural Network (GRNN) based on kernel smoothing techniques. Kernel smoothing provides a simple way of finding structure in data set without the imposition of a parametric model. The trajectory data of the reaction mechanism was generated based on the optimization techniques of genetic algorithm (GA). The NPCA-NN algorithm was then used for the reduction of Dimethyl Ether (DME) mechanism. DME is a recently discovered fuel made from natural gas, (and other feedstock such as coal, biomass, and urban wastes) which can be used in compression ignition engines as a substitute for diesel. An in-house two-dimensional Computational Fluid Dynamics (CFD) code was developed based on Meshfree technique and time marching solution algorithm. The project also provided valuable research experience to two graduate students.

  5. Chemical Modification Effect on the Mechanical Properties of Coir Fiber

    Directory of Open Access Journals (Sweden)

    Samia Sultana Mir

    2012-04-01

    Full Text Available Natural fiber has a vital role as a reinforcing agent due to its renewable, low cost, biodegradable, less abrasive and eco-friendly nature. Whereas synthetic fibers like glass, boron, carbon, metallic, ceramic and inorganic fibers are expensive and not eco-friendly. Coir is one of the natural fibers easily available in Bangladesh and cheap. It is derived from the husk of the coconut (Cocos nucifera. Coir has one of the highest concentrations of lignin, which makes it stronger. In recent years, wide range of research has been carried out on fiber reinforced polymer composites [4-13].The aim of the present research is to characterize brown single coir fiber for manufacturing polymer composites reinforced with characterized fibers. Adhesion between the fiber and polymer is one of factors affecting the strength of manufactured composites. In order to increase the adhesion, the coir fiber was chemically treated separately in single stage (with Cr2(SO43•12(H2O and double stages (with CrSO4 and NaHCO3. Both the raw and treated fibers were characterized by tensile testing, Fourier transform infrared (FTIR spectroscopic analysis, scanning electron microscopic analysis. The result showed that the Young’s modulus increased, while tensile strength and strain to failure decreased with increase in span length. Tensile properties of chemically treated coir fiber was found higher than raw coir fiber, while the double stage treated coir fiber had better mechanical properties compared to the single stage treated coir fiber. Scanning electron micrographs showed rougher surface in case of the raw coir fiber. The surface was found clean and smooth in case of the treated coir fiber. Thus the performance of coir fiber composites in industrial application can be improved by chemical treatment.

  6. Chemical degradation mechanisms of membranes for alkaline membrane fuel cells

    Energy Technology Data Exchange (ETDEWEB)

    Choe, Yoong-Kee [National Institute of Advanced Industrial Science and Technology, Umezono 1-1-1, Tsukuba (Japan); Henson, Neil J.; Kim, Yu Seung [Los Alamos National Laboratory, Los Alamos, NM (United States)

    2015-12-31

    Chemical degradation mechanisms of membranes for alkaline membrane fuel cells have been investigated using density functional theory (DFT). We have elucidated that the aryl-ether moiety of membranes is one of the weakest site against attack of hydroxide ions. The results of DFT calculations for hydroxide initiated aryl-ether cleavage indicated that the aryl-ether cleavage occurred prior to degradation of cationic functional group. Such a weak nature of the aryl-ether group arises from the electron deficiency of the aryl group as well as the low bond dissociation energy. The DFT results suggests that removal of the aryl-ether group in the membrane should enhance the stability of membranes under alkaline conditions. In fact, an ether fee poly(phenylene) membrane exhibits excellent stability against the attack from hydroxide ions.

  7. Chemical and Mechanical processes during burial diagenesis of chalk

    DEFF Research Database (Denmark)

    Borre, Mai Kirstine; Lind, Ida

    1998-01-01

    or larger influence on the textural development. In the chalk interval below, compaction is not the only porosity reducing agent but it has a larger influence on texture than concurrent recrystallization. Below 850 m grain-bridging cementation becomes important resulting in a lithified limestone below 1100......Burial diagenesis of chalk is a combination of mechanical compaction and chemical recrystallization as well as cementation. We have predicted the characteristic trends in specific surface resulting from these processes. The specific surface is normally measured by nitrogen adsorption but is here...... in the Pacific, where a > 1 km thick package of chalk facies sediments accumulated from the Cretaceous to the present. In the upper 200-300 m the sediment is unconsolidated carbonate ooze, throughout this depth interval compaction is the principal porosity reducing agent, but recrystallization has an equal...

  8. Mechanism of Interaction between Ionizing Radiation and Chemicals

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Jin Kyu; Lee, B. H.; Shin, H. S. (and others)

    2008-03-15

    This research project has been carried out jointly with INP (Poland) to develop technologies for 'Mechanism of Interaction between ionizing radiation and chemicals{sup .} Several biological end-points were assessed in experimental organisms such as higher plants, rats, cell lines and yeast cells to establish proper bioassay techniques. The Tradescantia somatic cell mutation assay was carried out, and immunohistochemistry and hormone assays were done in Fisher 344 rats and cell lines to analyse the combined effect of ionizing radiation with mercury chloride. Using the common regularities of combined actions of two factors, a theoretical model was established, and applied to the thermo radiation action and synergism between two chemicals, as well. The model approach made it possible to predict the condition under which the maximum synergism could be attained. The research results were published in high standard journals and presented in the scientific conferences to verify KAERI's current technology level. The experience of collaboration can be used as a fundamental tool for multinational collaboration, and make the role of improving relationship between Korea and Poland.

  9. Conversion Coatings for Aluminum Alloys by Chemical Vapor Deposition Mechanisms

    Science.gov (United States)

    Reye, John T.; McFadden, Lisa S.; Gatica, Jorge E.; Morales, Wilfredo

    2004-01-01

    With the rise of environmental awareness and the renewed importance of environmentally friendly processes, the United States Environmental Protection Agency has targeted surface pre-treatment processes based on chromates. Indeed, this process has been subject to regulations under the Clean Water Act as well as other environmental initiatives, and there is today a marked movement to phase the process out in the near future. Therefore, there is a clear need for new advances in coating technology that could provide practical options for replacing present industrial practices. Depending on the final application, such coatings might be required to be resistant to corrosion, act as chemically resistant coatings, or both. This research examined a chemical vapor deposition (CVD) mechanism to deposit uniform conversion coatings onto aluminum alloy substrates. Robust protocols based on solutions of aryl phosphate ester and multi-oxide conversion coating (submicron) films were successfully grown onto the aluminum alloy samples. These films were characterized by X-ray Photoelectron Spectroscopy (XPS). Preliminary results indicate the potential of this technology to replace aqueous-based chromate processes.

  10. Stress-induced light scattering method for the detection of latent flaws on fine polished glass substrates

    Science.gov (United States)

    Sakata, Y.; Sakai, K.; Nonaka, K.

    2014-08-01

    Fine polishing techniques, such as the chemical mechanical polishing treatment, are one of the most important technique to glass substrate manufacturing. Mechanical interaction in the form of friction occurs between the abrasive and the substrate surface during polishing, which may cause formation of latent flaws on the glass substrate surface. Fine polishing-induced latent flaws may become obvious during a subsequent cleaning process if glass surfaces are corroded away by chemical interaction with the cleaning liquid. Latent flaws thus reduce product yield. In general, non-destructive inspection techniques, such as the light-scattering methods, used to detect foreign matters on the glass substrate surface. However, it is difficult to detect latent flaws by these methods because the flaws remain closed. Authors propose a novel inspection technique for fine polishing-induced latent flaws by combining the light scattering method with stress effects, referred to as the stress-induced light scattering method (SILSM). SILSM is able to distinguish between latent flaws and particles on the surface. In this method, samples are deformed by an actuator and stress effects are induced around the tips of latent flaws. Due to the photoelastic effect, the refractive index of the material around the tip of a latent flaw is changed. This changed refractive index is in turn detected by a cooled charge-coupled device camera as variations in light scattering intensity. In this report, surface latent flaws are detected non-destructively by applying SILSM to glass substrates, and the utility of SILSM evaluated as a novel inspection technique.

  11. Polishing technique for beryllium mirror

    Science.gov (United States)

    Froechtenigt, J. F.

    1976-01-01

    Performance tests, accomplished by inserting entire X ray telescope and polished mirror into vacuum line 67 m long and taking photographs of an X ray resolution source, indicate that polishing increases mirror efficiency from 0.06 percent for X rays at 0.8 nm and increases resolution from 15 to 3.75 arc-seconds.

  12. Reading Authentic Polish, Volume II.

    Science.gov (United States)

    Walczynski, Waldemar

    The second volume on reading authentic Polish is the continuation of a supplementary textbook to be used either in the classroom or in independent study. The materials included in it are unaltered authentic texts from Polish newspapers, magazines, and other mass media that provide exposure to the context and format of everyday reading matter. The…

  13. Polish Americans. Second, Revised Edition.

    Science.gov (United States)

    Lopata, Helen Znaniecka

    This book examines Polonia, the Polish ethnic community in America created by three giant waves of immigration between 1880 and 1990. The complicated history of this ethnic group is reflected in the lives of increasing numbers of Polish Americans, including recent immigrants brought by political and economic changes, as they achieve middle class…

  14. [Lysenkoism in Polish botany].

    Science.gov (United States)

    Köhler, Piotr

    2008-01-01

    Lysenkoism in Poland was never an autonomous phenomenon. The whole array of reasons for which it appeared in Polish science would require a separate study--here it only needs to be pointed out that the major reasons included terror on the part of the security service, lawlessness, the ubiquitous atmosphere of intimidation and terror, censorship, the diminishing sphere of civil liberties, political show trials, propaganda and denunciations. An important role in facilitating the introduction of Lysenkoism was played also by the reorganization of science after World War Two, the isolation of Polish science from science in the West, as well as the damage it had suffered during the war. At first, Lysenkoism was promoted in Poland by a small group of enthusiastic and uncritical proponents. A overview of the events connected with the ten years of Lysenkoism in Poland (end of 1948--beginning of 1958) shows a two-tier picture of how the 'idea' was propagated. The first tier consisted in the activities of the Association of Marxist Naturalists [Koło Przyrodników-Marksistów], which it engaged in since the end of 1948. The Association was later transformed into a Union of Marxist Naturalists, and this in turn merged, in 1952, with the Copernican Society of Polish Naturalists [Polskie Towarzystwo Przyrodników im. Kopernika]. It was that society which promoted Lysenkoism longest, until the end of 1956. The propaganda and training activities of the circle and the society prepared ground for analogous activities of the newly formed Polish Academy of Science (PAN), which--since its very establishment in 1952--engaged in promoting Lysenkoism through its Second Division. These activities were aimed at naturalists, initially at those who were prominent scientists (eg. the conference at Kuźnice, 1950/1951), and then at those who were only starting their academic career (including national courses in new biology at Dziwnów, 1952, or Kortowo, 1953 and 1955). The end to promoting

  15. Temperature buffer test. Hydro-mechanical and chemical/ mineralogical characterizations

    Energy Technology Data Exchange (ETDEWEB)

    Aakesson, Mattias; Olsson, Siv; Dueck, Ann; Nilsson, Ulf; Karnland, Ola [Clay Technology AB, Lund (Sweden); Kiviranta, Leena; Kumpulainen, Sirpa [BandTech Oy, Helsinki (Finland); Linden, Johan [Aabo Akademi, Aabo (Finland)

    2012-01-15

    The Temperature Buffer Test (TBT) is a joint project between SKB/ANDRA and supported by ENRESA (modeling) and DBE (instrumentation), which aims at improving the understanding and to model the thermo-hydro-mechanical behavior of buffers made of swelling clay submitted to high temperatures (over 100 deg C) during the water saturation process. The test has been carried out in a KBS-3 deposition hole at Aspo HRL. It was installed during the spring of 2003. Two steel heaters (3 m long, 0.6 m diameter) and two buffer arrangements have been investigated: the lower heater was surrounded by rings of compacted Wyoming bentonite only, whereas the upper heater was surrounded by a composite barrier, with a sand shield between the heater and the bentonite. The test was dismantled and sampled during the winter of 2009/2010. This report presents the hydro-mechanical and chemical/mineralogical characterization program which was launched subsequent to the dismantling operation. The main goal has been to investigate if any significant differences could be observed between material from the field experiment and the reference material. The field samples were mainly taken from Ring 4 (located at the mid-section around the lower heater), in which the temperature in the innermost part reached 155 deg C. The following hydro-mechanical properties have been determined for the material (test technique within brackets): hydraulic conductivity (swelling pressure device), swelling pressure (swelling pressure device), unconfined compression strength (mechanical press), shear strength (triaxial cell) and retention properties (jar method). The following chemical/mineralogical properties (methods within brackets) were determined: anion analysis of water leachates (IC), chemical composition (ICP/AES+MS, EGA), cation exchange capacity (CEC, Cu-trien method) and exchangeable cations (exchange with NH4, ICPAES), mineralogical composition (XRD and FTIR), element distribution and microstructure (SEM and

  16. Mechanical and chemical properties of cysteine-modified kinesin molecules.

    Science.gov (United States)

    Iwatani, S; Iwane, A H; Higuchi, H; Ishii, Y; Yanagida, T

    1999-08-10

    To probe the structural changes within kinesin molecules, we made the mutants of motor domains of two-headed kinesin (4-411 aa) in which either all the five cysteines or all except Cys45 were mutated. A residual cysteine (Cys45) of the kinesin mutant was labeled with an environment-sensitive fluorescent probe, acrylodan. ATPase activity, mechanical properties, and fluorescence intensity of the mutants were measured. Upon acrylodan-labeled kinesin binding to microtubules in the presence of 1 mM AMPPNP, the peak intensity was enhanced by 3.4-fold, indicating the structural change of the kinesin head by the binding. Substitution of cysteines decreased both the maximum microtubule-activated ATPase and the sliding velocity to the same extent. However, the maximum force and the step size were not affected; the force produced by a single molecule was 6-6.5 pN, and a step size due to the hydrolysis of one ATP molecule by kinesin molecules was about 10 nm for all kinesins. This step size was close to a unitary step size of 8 nm. Thus, the mechanical events of kinesin are tightly coupled with the chemical events.

  17. Subjective Quality of Life of Polish, Polish-Immigrant, and Polish-American Elderly.

    Science.gov (United States)

    Berdes, Celia; Zych, Adam A.

    2000-01-01

    Compares subjective quality of life of elderly Poles living in Poland, and Polish immigrants and Polish-American ethnics living in Chicago as part of a secondary data analysis of a study initially conducted in Poland. Conclusions lend support to the idea that U.S.-born elderly people and elderly immigrants to the United States have a significantly…

  18. Protein's native state stability in a chemically induced denaturation mechanism.

    Science.gov (United States)

    Olivares-Quiroz, L; Garcia-Colin, L S

    2007-05-21

    In this work, we present a generalization of Zwanzig's protein unfolding analysis [Zwanzig, R., 1997. Two-state models of protein folding kinetics. Proc. Natl Acad. Sci. USA 94, 148-150; Zwanzig, R., 1995. Simple model of protein folding kinetics. Proc. Natl Acad. Sci. USA 92, 9801], in order to calculate the free energy change Delta(N)(D)F between the protein's native state N and its unfolded state D in a chemically induced denaturation. This Extended Zwanzig Model (EZM) is both based on an equilibrium statistical mechanics approach and the inclusion of experimental denaturation curves. It enables us to construct a suitable partition function Z and to derive an analytical formula for Delta(N)(D)F in terms of the number K of residues of the macromolecule, the average number nu of accessible states for each single amino acid and the concentration C(1/2) where the midpoint of the ND transition occurs. The results of the EZM for proteins where chemical denaturation follows a sigmoidal-type profile, as it occurs for the case of the T70N human variant of lysozyme (PDB code: T70N) [Esposito, G., et al., 2003. J. Biol. Chem. 278, 25910-25918], can be splitted into two lines. First, EZM shows that for sigmoidal denaturation profiles, the internal degrees of freedom of the chain play an outstanding role in the stability of the native state. On the other hand, that under certain conditions DeltaF can be written as a quadratic polynomial on concentration C(1/2), i.e., DeltaF approximately aC(1/2)(2)+bC(1/2)+c, where a,b,c are constant coefficients directly linked to protein's size K and the averaged number of non-native conformations nu. Such functional form for DeltaF has been widely known to fit experimental measures in chemically induced protein denaturation [Yagi, M., et al., 2003. J. Biol. Chem. 278, 47009-47015; Asgeirsson, B., Guojonsdottir, K., 2006. Biochim. Biophys. Acta 1764, 190-198; Sharma, S., et al., 2006. Protein Pept. Lett. 13(4), 323-329; Salem, M., et al

  19. Surface-treated commercially pure titanium for biomedical applications: Electrochemical, structural, mechanical and chemical characterizations

    Energy Technology Data Exchange (ETDEWEB)

    Ogawa, Erika S.; Matos, Adaias O.; Beline, Thamara [Department of Prosthodontics and Periodontology, Piracicaba Dental School, University of Campinas (UNICAMP), Av Limeira, 901, Piracicaba, São Paulo 13414-903 (Brazil); IBTN/Br—Institute of Biomaterials, Tribocorrosion and Nanomedicine—Brazilian Branch (Brazil); Marques, Isabella S.V. [Department of Prosthodontics and Periodontology, Piracicaba Dental School, University of Campinas (UNICAMP), Av Limeira, 901, Piracicaba, São Paulo 13414-903 (Brazil); Sukotjo, Cortino [Department of Restorative Dentistry, University of Illinois at Chicago, College of Dentistry, 801 S Paulina, Chicago, IL, USA, 60612 (United States); IBTN—Institute of Biomaterials, Tribocorrosion and Nanomedicine (United States); Mathew, Mathew T. [IBTN—Institute of Biomaterials, Tribocorrosion and Nanomedicine (United States); Department of Biomedical Sciences, University of Illinois, College of Medicine at Rockford, 1601 Parkview Avenue, Rockford, IL, USA, 61107 (United States); Rangel, Elidiane C.; Cruz, Nilson C. [IBTN/Br—Institute of Biomaterials, Tribocorrosion and Nanomedicine—Brazilian Branch (Brazil); Laboratory of Technological Plasmas, Engineering College, Univ Estadual Paulista (UNESP), Av Três de Março, 511, Sorocaba, São Paulo 18087-180 (Brazil); Mesquita, Marcelo F.; Consani, Rafael X. [Department of Prosthodontics and Periodontology, Piracicaba Dental School, University of Campinas (UNICAMP), Av Limeira, 901, Piracicaba, São Paulo 13414-903 (Brazil); and others

    2016-08-01

    Modified surfaces have improved the biological performance and biomechanical fixation of dental implants compared to machined (polished) surfaces. However, there is a lack of knowledge about the surface properties of titanium (Ti) as a function of different surface treatment. This study investigated the role of surface treatments on the electrochemical, structural, mechanical and chemical properties of commercial pure titanium (cp-Ti) under different electrolytes. Cp-Ti discs were divided into 6 groups (n = 5): machined (M—control); etched with HCl + H{sub 2}O{sub 2} (Cl), H{sub 2}SO{sub 4} + H{sub 2}O{sub 2} (S); sandblasted with Al{sub 2}O{sub 3} (Sb), Al{sub 2}O{sub 3} followed by HCl + H{sub 2}O{sub 2} (SbCl), and Al{sub 2}O{sub 3} followed by H{sub 2}SO{sub 4} + H{sub 2}O{sub 2} (SbS). Electrochemical tests were conducted in artificial saliva (pHs 3; 6.5 and 9) and simulated body fluid (SBF—pH 7.4). All surfaces were characterized before and after corrosion tests using atomic force microscopy, scanning electron microscopy, energy dispersive microscopy, X-ray diffraction, surface roughness, Vickers microhardness and surface free energy. The results indicated that Cl group exhibited the highest polarization resistance (R{sub p}) and the lowest capacitance (Q) and corrosion current density (I{sub corr}) values. Reduced corrosion stability was noted for the sandblasted groups. Acidic artificial saliva decreased the R{sub p} values of cp-Ti surfaces and produced the highest I{sub corr} values. Also, the surface treatment and corrosion process influenced the surface roughness, Vickers microhardness and surface free energy. Based on these results, it can be concluded that acid-etching treatment improved the electrochemical stability of cp-Ti and all treated surfaces behaved negatively in acidic artificial saliva. - Highlights: • Characterization of surface treatment for biomedical implants was investigated. • Sandblasting reduced the corrosion stability of cp

  20. Mechanisms and chemical induction of aneuploidy in rodent germ cells

    Energy Technology Data Exchange (ETDEWEB)

    Mailhes, J B; Marchetti, F

    2004-10-15

    The objective of this review is to suggest that the advances being made in our understanding of the molecular events surrounding chromosome segregation in non-mammalian and somatic cell models be considered when designing experiments for studying aneuploidy in mammalian germ cells. Accurate chromosome segregation requires the temporal control and unique interactions among a vast array of proteins and cellular organelles. Abnormal function and temporal disarray among these, and others to be inidentified, biochemical reactions and cellular organelles have the potential for predisposing cells to aneuploidy. Although numerous studies have demonstrated that certain chemicals (mainly those that alter microtubule function) can induce aneuploidy in mammalian germ cells, it seems relevant to point out that such data can be influenced by gender, meiotic stage, and time of cell-fixation post-treatment. Additionally, a consensus has not been reached regarding which of several germ cell aneuploidy assays most accurately reflects the human condition. More recent studies have shown that certain kinase, phosphatase, proteasome, and topoisomerase inhibitors can also induce aneuploidy in rodent germ cells. We suggest that molecular approaches be prudently incorporated into mammalian germ cell aneuploidy research in order to eventually understand the causes and mechanisms of human aneuploidy. Such an enormous undertaking would benefit from collaboration among scientists representing several disciplines.

  1. Performance of a hybrid chemical/mechanical heat pump

    Science.gov (United States)

    Silvestri, John J.; Scaringe, Robert P.; Grzyll, Lawrence R.

    1990-01-01

    The authors present the design and preliminary results of the performance of a hybrid chemical/mechanical, low-lift (20 C) heat pump. Studies have indicated that this heat pump has several advantages over the traditional single fluid vapor compression (reverse Rankine) heat pump. Included in these benefits are: 1) increased COPc due to the approximation of the cycle to the Lorenz cycle and due to the availability of the heat of solution, along with the heat of vaporization, to provide cooling; and 2) ease of variation in system cooling capacity by changing the fluid composition. The system performance is predicted for a variety of refrigerant-absorbent pairs. Cooling capacity is determined for systems operating with ammonia as the refrigerant and lithium nitrate and sodium thiocyanate as the absorbents and also with water as the refrigerant and magnesium chloride, potassium hydroxide, lithium bromide, sodium hydroxide, and sulfuric acid as the absorbents. Early indications have shown that the systems operating with water as the refrigerant operate at 2-4 times the capacity of the ammonia-refrigerant-based systems. Using existing working fluids in the proposed innovative design, a coefficient-of-performance improvement of 21 percent is possible when compared to the best vapor compression systems analyzed.

  2. Endocrine-Disrupting Chemicals: Associated Disorders and Mechanisms of Action

    Directory of Open Access Journals (Sweden)

    Sam De Coster

    2012-01-01

    Full Text Available The incidence and/or prevalence of health problems associated with endocrine-disruption have increased. Many chemicals have endocrine-disrupting properties, including bisphenol A, some organochlorines, polybrominated flame retardants, perfluorinated substances, alkylphenols, phthalates, pesticides, polycyclic aromatic hydrocarbons, alkylphenols, solvents, and some household products including some cleaning products, air fresheners, hair dyes, cosmetics, and sunscreens. Even some metals were shown to have endocrine-disrupting properties. Many observations suggesting that endocrine disruptors do contribute to cancer, diabetes, obesity, the metabolic syndrome, and infertility are listed in this paper. An overview is presented of mechanisms contributing to endocrine disruption. Endocrine disruptors can act through classical nuclear receptors, but also through estrogen-related receptors, membrane-bound estrogen-receptors, and interaction with targets in the cytosol resulting in activation of the Src/Ras/Erk pathway or modulation of nitric oxide. In addition, changes in metabolism of endogenous hormones, cross-talk between genomic and nongenomic pathways, cross talk with estrogen receptors after binding on other receptors, interference with feedback regulation and neuroendocrine cells, changes in DNA methylation or histone modifications, and genomic instability by interference with the spindle figure can play a role. Also it was found that effects of receptor activation can differ in function of the ligand.

  3. The Mechanism of Surface Chemical Kinetics of Dissolution of Minerals

    Institute of Scientific and Technical Information of China (English)

    谭凯旋; 张哲儒; 等

    1996-01-01

    This paper deals with the mechanism of dissolution reaction kinetics of minerals in aqueous solution based on the theory of surface chemistry.Surface chemical catalysis would lead to an obvous decrease in active energy of dissolution reaction of minerals.The dissolution rate of minerals is controlled by suface adsorption,surface exchange reaction and desorption,depending on pH of the solution and is directly proportional to δHn0+,When controlled by surface adsorption,i.e.,nθ=1,the dissolution rate will decrease with increasing pH;when controlled by surface exchane reaction,i.e.,nθ=0,the dissolution rate is independent of pH;when controlled by desorption,nθis a positive decimal between 0 and 1 in acidic solution and a negative decimal between-1 and 0 in alkaline solution.Dissolution of many minerals is controlled by surface adsorption and/or surface exchange reactions under acid conditions and by desorption under alkaline conditions.

  4. Polishing of denture base acrylic resin with chairside polishing kits: an SEM and surface roughness study.

    Science.gov (United States)

    Chatzivasileiou, Konstantinos; Emmanouil, Ioannis; Kotsiomiti, Eleni; Pissiotis, Argirios

    2013-01-01

    Heat-cured acrylic resin specimens were polished using either conventional laboratory polishing, sandpaper, or three commercial chairside kits. The surface roughness of the polished specimens was measured with a contact profilometer. Scanning electron microscopy was used to obtain microphotographs of the polished surfaces. Laboratory polishing produced the smoothest surfaces in all cases, while sandpaper application produced the roughest. Use of the chairside polishing kits resulted in significantly rougher surfaces compared to those produced by laboratory polishing. Nonetheless, polishing of trimmed denture bases using chairside polishing kits is an effective alternative procedure for cases in which the laboratory procedure is not applicable.

  5. Co - pyrolysis of biomass and Polish lignite

    Energy Technology Data Exchange (ETDEWEB)

    Kordylewski, Wlodzimierz; Stojanowska, Grazyna [Politechnika Wroclawska, Wroclaw (Poland); Jones, Jenny [Univ. of Leeds (United Kingdom). Energy and Resources Research Inst.

    2006-01-15

    The paper presents results of studies of the chemical decomposition of coal, biomass and their blends during low rate heating gasification in atmosphere of air or nitrogen. Polish lignite (Turow), sawdust of pine and blends of these two fuels have been used in the research and it has been investigated the influence of ion exchanged calcium on their pyrolysis. The primary products of devolatilization provided important information for understanding subsequently the leading to toxic organic compounds and synergistic effects of these fuels. The influence of blending ratio and influence of calcium catalysts was discussed.

  6. Response of mechanical properties of glasses to their chemical, thermal and mechanical histories

    DEFF Research Database (Denmark)

    Yue, Yuanzheng

    , surface, thermal history or excess entropy of the final glass state. Here I review recent progresses in understanding of the responses of mechanical properties of oxide glasses to the compositional variation, thermal history and mechanical deformation. The tensile strength, elastic modulus and hardness...... and hardness of glass fibers are strongly correlated with the glass composition, fictive temperature, axial tension, and redox state. This correlation is explained by considering both the bulk and the surface glass structure. Furthermore, the compositional dependence of the densification extent, plastic flow...... of glass fibers are dependent on the thermal history (measured as fictive temperature), tension, chemical composition and redox state. However, the fictive temperature affects the hardness of bulk glass in a complicated manner, i.e., the effect does not exhibit a clear regularity in the range...

  7. Effect of electrochemical polishing time on surface topography of mild steel

    Institute of Scientific and Technical Information of China (English)

    Baocheng Wang; Jinhua Zhu

    2007-01-01

    The variation in altitude density function (ADF) of the surface topography of mild steel during electrochemical polishing (ECP) was investigated, and the mechanism of the variation of surface roughness with polishing time was analyzed. The results show that the variation trend of ADF with polishing time is flat-steep-flat; the variation of surface roughness results in the different distributions of surface current density, and there is a fine surface smoothness in the special period of ECP from 4 to 8 s.

  8. Tooth polishing: The current status

    Directory of Open Access Journals (Sweden)

    Madhuri Alankar Sawai

    2015-01-01

    Full Text Available Healthy teeth and gums make a person feel confident and fit. As people go about their daily routines and with different eating and drinking habits, the tooth enamel turns yellowish or gets stained. Polishing traditionally has been associated with the prophylaxis procedure in most dental practices, which patients know and expect. However, with overzealous use of polishing procedure, there is wearing of the superficial tooth structure. This would lead to more accumulation of local deposits. Also, it takes a long time for the formation of the fluoride-rich layer of the tooth again. Hence, now-a-days, polishing is not advised as a part of routine oral prophylaxis procedure but is done selectively based on the patients′ need. The article here, gives an insight on the different aspects of the polishing process along with the different methods and agents used for the same.

  9. Tooth polishing: The current status.

    Science.gov (United States)

    Sawai, Madhuri Alankar; Bhardwaj, Ashu; Jafri, Zeba; Sultan, Nishat; Daing, Anika

    2015-01-01

    Healthy teeth and gums make a person feel confident and fit. As people go about their daily routines and with different eating and drinking habits, the tooth enamel turns yellowish or gets stained. Polishing traditionally has been associated with the prophylaxis procedure in most dental practices, which patients know and expect. However, with overzealous use of polishing procedure, there is wearing of the superficial tooth structure. This would lead to more accumulation of local deposits. Also, it takes a long time for the formation of the fluoride-rich layer of the tooth again. Hence, now-a-days, polishing is not advised as a part of routine oral prophylaxis procedure but is done selectively based on the patients' need. The article here, gives an insight on the different aspects of the polishing process along with the different methods and agents used for the same.

  10. Fused-Polished Fiber Couplers

    Institute of Scientific and Technical Information of China (English)

    Sien; Chi; Shiao-Min; Tseng

    2003-01-01

    We report on fused-polished fiber couplers with a new fabrication method. This structure so fabricated is promising while achieving high-performance all-fiber WDM devices. Potential advantages and prospects of our works are presented.

  11. Chemical Sensory Mechanisms of Insects%昆虫的化学感觉机理

    Institute of Scientific and Technical Information of China (English)

    娄永根; 程家安

    2001-01-01

    Insects possess two kinds of chemical sensory organ,olfactoryorgan and gustatory organ,by which they can perceive chemical cues in the circumstance and subsequently make a series of corresponding behavioral responses.From perceiving chemical cues to making behavioral responses,it involves in information coding,proceeding and integration to chemical cues at various level in insect nerve system.New pest control methods will be developed with the elucidation of insect chemical sensory mechanisms.

  12. The impact of 90 years of drainage works on some chemical properties of raised peat bog organic soils - case study from valley of the Upper San river in Polish Bieszczady Mts. (Eastern Carpathians).

    Science.gov (United States)

    Stolarczyk, Mateusz

    2016-04-01

    Wetland ecosystems, including raised peat bogs are characterized by a specific water conditions and unique vegetation, which makes peatland highly important habitats due to protection of biodiversity. Transformation of peat bog areas is particularly related to changes in the environment e.g. according to reclamation works. Drainage of peatlands is directly associated to the decrease of groundwater levels and lead to a number of changes in the chemical and physical properties of peat material, included contents of exchangeable cations in the surface layers of peat soils in the decession phase of peat development and release above compounds from the soil to ground or surface waters. The aim of the research was to determine the impact of extended drainage works on chemical composition of sorption complex of raised peat bog organic soils and identification the potential environmental effects of alkaline cations leaching to the surface waters. Research was carried out on the peat bogs located in the Upper San valley in Polish Bieszczady Mts. (Eastern Carpathians). Soil samples used in this study were collected from 3 soil profiles in 10 or 20 cm intervals to the approximately 130 cm depth. Laboratory analyses included determination of basic properties of organic material such as the degree of peat decomposition, ash content, soil pH and carbon, hydrogen, nitrogen concentrations. Additionally the amount of alkaline cations, exchangeable and extractable acidity was determined. Furthermore, the degree of saturation of the sorption complex with alkaline cations (V) and cation exchange capacity (CEC) are calculated. In order to evaluate the impact of the examined peat bog to the environment, also water samples were collected and ions composition was measured. The obtained results show that studied organic soils are oligotrophic and strongly acidic. In the case of organic material related to decession phase of peat development, as a result of the lengthy drainage works

  13. Astronarium - Filmography of Polish Astronomy

    Science.gov (United States)

    Radajewski, Bogumił; Mikołajewski, Maciej; Czart, Krzysztof; Guz, Iwona; Rubaszewski, Adam; Stelmach, Tomasz

    2016-06-01

    ``Astronarium'' is a series of TV programs about astronomy and space research co-produced by the Polish Astronomical Society and Polish Television. It has been planned for three seasons and 34 episodes in total (8, 13 and 13 per season). The first season was presented in March and April 2015 and the second started in September 2015. The third one is planned for 2016. ``Astronarium'' has been broadcast on the nationwide channel TVP Regionalna, which later changed its name to TVP 3.

  14. Chemical and mechanical interactions of interstitials with vanadium alloys

    Energy Technology Data Exchange (ETDEWEB)

    DiStefano, J.R.; Chitwood, L.D.; DeVan, J.H. [Oak Ridge National Laboratory, TN (United States)

    1996-04-01

    Oxidation studies of V-4Cr-4Ti were conducted in air and reduced oxygen partial pressures (10{sup 4}, 10{sup -5} and 10{sup -6} torr). Reaction rates were determined by weight change measurements and chemical analyses. Mechanical properties after the exposures were determined by room temperature tensile tests. In air at 400 and 500{degrees}C, oxide films form on the surface. Initially, rates are high but decrease with time reaching similiar values to those found in oxygen partial pressures at 10{sup -4}, 10{sup -5}, and 10{sup -6} torr. At 400{degrees}C, oxygen pick-up followed a logarithmic function of time and was confined to regions near the surface. Little change in room temperature tensile properties was noted for oxygen increase up to 1500 ppm. Thermal cycling specimens from 400{degrees}C to room temperature up to 14 times had no apparent effect on oxidation rate or tensile properties. At 500{degrees}C, oxygen pick-up appeared to follow a parabolic relation with time. Rates were {approx} 10 times those at 400{degrees}C and correspondingly larger oxygen increases occurred when compared with the 400{degrees}C tests after similiar time periods. This resulted in a significant decrease in total elongation after 240 h. At reduced oxygen partial pressures, rates were measured for times <100 h. Data are relatively sparse but generally show a slightly higher initial rate before slowing. At 400{degrees}C increases to {approx}200 ppm oxygen were found with no effect on room temperature elongation. At 500{degrees}C increase in oxygen of 2400 ppm after 50h/10{sup -5} torr resulted in a decrease of around 25% in room temperature elongation. By comparison, exposure to air at 500{degrees}C for 12 h caused nearly the same results.

  15. Modeling regional secondary organic aerosol using the Master Chemical Mechanism

    Science.gov (United States)

    Li, Jingyi; Cleveland, Meredith; Ziemba, Luke D.; Griffin, Robert J.; Barsanti, Kelley C.; Pankow, James F.; Ying, Qi

    2015-02-01

    A modified near-explicit Master Chemical Mechanism (MCM, version 3.2) with 5727 species and 16,930 reactions and an equilibrium partitioning module was incorporated into the Community Air Quality Model (CMAQ) to predict the regional concentrations of secondary organic aerosol (SOA) from volatile organic compounds (VOCs) in the eastern United States (US). In addition to the semi-volatile SOA from equilibrium partitioning, reactive surface uptake processes were used to simulate SOA formation due to isoprene epoxydiol, glyoxal and methylglyoxal. The CMAQ-MCM-SOA model was applied to simulate SOA formation during a two-week episode from August 28 to September 7, 2006. The southeastern US has the highest SOA, with a maximum episode-averaged concentration of ∼12 μg m-3. Primary organic aerosol (POA) and SOA concentrations predicted by CMAQ-MCM-SOA agree well with AMS-derived hydrocarbon-like organic aerosol (HOA) and oxygenated organic aerosol (OOA) urban concentrations at the Moody Tower at the University of Houston. Predicted molecular properties of SOA (O/C, H/C, N/C and OM/OC ratios) at the site are similar to those reported in other urban areas, and O/C values agree with measured O/C at the same site. Isoprene epoxydiol is predicted to be the largest contributor to total SOA concentration in the southeast US, followed by methylglyoxal and glyoxal. The semi-volatile SOA components are dominated by products from β-caryophyllene oxidation, but the major species and their concentrations are sensitive to errors in saturation vapor pressure estimation. A uniform decrease of saturation vapor pressure by a factor of 100 for all condensable compounds can lead to a 150% increase in total SOA. A sensitivity simulation with UNIFAC-calculated activity coefficients (ignoring phase separation and water molecule partitioning into the organic phase) led to a 10% change in the predicted semi-volatile SOA concentrations.

  16. Structures and Stabilization Mechanisms in Chemically Stabilized Ceramics

    Science.gov (United States)

    Gai-Boyes, Pratibha L.; Saltzberg, Michael A.; Vega, Alexander

    1993-09-01

    Structural complexities and disorder in chemically stabilized cristobalites (CSC), which are room temperature silica-based ceramics, prepared by a wet chemical route, are described. CSC displays many of the structural characteristics of the high temperature cristobalite, elucidated by HREM and X-ray diffraction. In-situ electron diffraction and NMR results suggest that the disorder is structural and is static.

  17. Electrochemical polishing of notches

    Science.gov (United States)

    Kephart, Alan R.; Alberts, Alfred H.

    1989-01-01

    An apparatus and method are disclosed for the selective electrochemical polishing of a lateral tip of a deep longitudinal notch in a work piece used to test crack initiation properties of materials. A DC power source is connected to the work piece and to an electrode disposed laterally along the distal end of an insulated body which is inserted in the longitudinal notch. The electrode and distal end of the body are disposed along the tip of the notch, but are spaced from the notch so as to provide a lateral passage for an electrolyte. The electrolyte is circulated through the passage so that the electrolyte only contacts the work piece adjacent the passage. Conveniently, the electrolyte is circulated by use of an inlet tube and an outlet tube provided at opposite ends of the passage. These tubes are preferably detachably located adjacent the ends of the passage and suitable seals are provided. A holding device including arms to which the tubes are attached is conveniently used to rapidly and easily locate the test specimen with the passage aligned with the tubes. The electrode is preferably a wire which is located in grooves along the distal end of the insulated body and up one side of the body or a plastic sheath insulated thin metal strip.

  18. High-Productivity Ultraprecise Polishing Technique of CVD Diamond Film%CVD金刚石膜高效超精密抛光技术

    Institute of Scientific and Technical Information of China (English)

    苑泽伟; 金洙吉; 王坤; 温泉

    2011-01-01

    CVD diamond film, as the material for optical transmission windows and new-generation computer chips, is required to be fine polished. However, there is so far no individual method which can polish CVD diamond film with both high efficiency and fine polishing quality. This paper attempted to polish CVD diamond film by combining chemical mechanical polishing (CMP) method and mechanical polishing method. CVD diamond film was first polished by fixed abrasive and free diamond abrasive to remove course asperities, and subsequently polished by CMP to achieve fine surface. According to the experimental results, the material removal rate achieved by free diamond abrasive is much higher than that by fixed abrasive. The surface roughness of CVD diamond film polished by free diamond abrasive is about 42. 2 nm. Fine surface quality of CVD diamond film was achieved by CMP and the surface roughness is about 4. 551 nm.%CVD金刚石膜作为光学透射窗口和新一代计算机芯片的材料,其表面必须得到高质量抛光,但是现存方法难以满足既高效又超精密的加工要求.本文提出机械抛光与化学机械抛光相结合的方法.首先,采用固结金刚石磨料抛光盘和游离金刚石磨料两种机械抛光方法对CVD金刚石膜进行粗加工,然后采用化学机械抛光的方法对CVD金刚石膜进行精加工.结果表明,采用游离磨料抛光时材料去除率远比固结磨料高,表面粗糙度最低达到42.2 nm.化学机械抛光方法在CVD金刚石膜的超精密抛光中表现出较大的优势,CVD金刚石膜的表面粗糙度为4.551 nm.

  19. Fundamental study of mechanical and chemical degradation mechanisms of PEM fuel cell membranes

    Science.gov (United States)

    Yoon, Wonseok

    One of the important factors determining the lifetime of polymer electrolyte membrane fuel cells (PEMFCs) is membrane degradation and failure. The lack of effective mitigation methods is largely due to the currently very limited understanding of the underlying mechanisms for mechanical and chemical degradations of fuel cell membranes. In order to understand degradation of membranes in fuel cells, two different experimental approaches were developed; one is fuel cell testing under open circuit voltage (OCV) with bi-layer configuration of the membrane electrode assemblies (MEAs) and the other is a modified gas phase Fenton's test. Accelerated degradation tests for polymer electrolyte membrane (PEM) fuel cells are frequently conducted under open circuit voltage (OCV) conditions at low relative humidity (RH) and high temperature. With the bi-layer MEA technique, it was found that membrane degradation is highly localized across thickness direction of the membrane and qualitatively correlated with location of platinum (Pt) band through mechanical testing, Infrared (IR) spectroscopy, fluoride emission, scanning electron microscopy (SEM), transmission electron microscopy (TEM), and energy dispersive spectroscopy (EDS) measurement. One of the critical experimental observations is that mechanical behavior of membranes subjected to degradation via Fenton's reaction exhibit completely different behavior with that of membranes from the OCV testing. This result led us to believe that other critical factors such as mechanical stress may affect on membrane degradation and therefore, a modified gas phase Fenton's test setup was developed to test the hypothesis. Interestingly, the results showed that mechanical stress directly accelerates the degradation rate of ionomer membranes, implying that the rate constant for the degradation reaction is a function of mechanical stress in addition to commonly known factors such as temperature and humidity. Membrane degradation induced by

  20. Program Helps To Determine Chemical-Reaction Mechanisms

    Science.gov (United States)

    Bittker, D. A.; Radhakrishnan, K.

    1995-01-01

    General Chemical Kinetics and Sensitivity Analysis (LSENS) computer code developed for use in solving complex, homogeneous, gas-phase, chemical-kinetics problems. Provides for efficient and accurate chemical-kinetics computations and provides for sensitivity analysis for variety of problems, including problems involving honisothermal conditions. Incorporates mathematical models for static system, steady one-dimensional inviscid flow, reaction behind incident shock wave (with boundary-layer correction), and perfectly stirred reactor. Computations of equilibrium properties performed for following assigned states: enthalpy and pressure, temperature and pressure, internal energy and volume, and temperature and volume. Written in FORTRAN 77 with exception of NAMELIST extensions used for input.

  1. A scanning electron microscopy comparison of enamel polishing methods after air-rotor stripping.

    Science.gov (United States)

    Piacentini, C; Sfondrini, G

    1996-01-01

    In the last few years, orthodontic literature has shown particular interest in the interproximal enamel reduction technique described as stripping or slenderizing. Most researchers have shown, by scanning electron microscopy (SEM) studies, the difficulties encountered while attempting to remove coarse abrasions left after stripping with the first instrument. The objective of this SEM study was to compare the different polishing methods proposed in the literature and to assess the efficiency of our own procedure. For this purpose, 48 healthy human teeth (premolars and molars) were used after removal for orthodontic or periodontal reasons. The teeth were divided into eight groups of six teeth each (two molars and four premolars), and mounted on a typodont to simulate a clinical situation. Each group underwent stripping according to one of the following techniques: 16-blade tungsten carbide bur and fine and ultrafine diamond burs; coarse diamond bur and fine and ultrafine diamond burs; coarse diamond disk and Sof-Lex disks (Dental products/3M, St. Paul, Minn.); 16-blade tungsten carbide bur and phosphoric acid on finishing strip; and 8-straight blade tungsten carbide diamond bur and Sof-Lex disks. The SEM investigations demonstrated that it is not possible to eliminate, with normal polishing and cleaning methods, the furrows left on the enamel both by the diamond burs and the diamond disks and the 16-blade tungsten carbide burs. Mechanical and chemical stripping as well did not prove to be effective. By contrast, with the use of a 8-straight blade tungsten carbide bur followed by Sof-Lex disks for polishing the enamel, it is possible to obtain well-polished surfaces that many times appear smoother than the intact or untreated enamel.

  2. Research progress in tribo-electrochemistry and tribo-electrochemical polishing

    Institute of Scientific and Technical Information of China (English)

    ZHAI Wenjie

    2007-01-01

    In this paper, the status quo and recent progress in the research on tribo-electrochemistry in aqueous and non-aqueous media, respectively, are reviewed. Much more attention has been paid to the tribo-electrochemical mechanisms for the control of friction and wear. Based on a summary of the conventional polishing principles of hard and brittle materials, the tribo-electrochemical polishing method is proposed. The results of the preliminary test show that tribo-electrochemical polishing is promising to become a critical technology in the high efficient polishing and planarization of microelectronic materials.

  3. Laser polishing for topography management of accelerator cavity surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Liang [College of William and Mary, Williamsburg, VA (United States); Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Klopf, J. Mike [College of William and Mary, Williamsburg, VA (United States); Reece, Charles E. [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Kelley, Michael J. [College of William and Mary, Williamsburg, VA (United States); Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)

    2015-07-20

    Improved energy efficiency and reduced cost are greatly desired for advanced particle accelerators. Progress toward both can be made by atomically-smoothing the interior surface of the niobium superconducting radiofrequency accelerator cavities at the machine's heart. Laser polishing offers a green alternative to the present aggressive chemical processes. We found parameters suitable for polishing niobium in all surface states expected for cavity production. As a result, careful measurement of the resulting surface chemistry revealed a modest thinning of the surface oxide layer, but no contamination.

  4. Polish-German bilingualism at school. A Polish perspective

    Directory of Open Access Journals (Sweden)

    Pulaczewska, Hanna

    2014-03-01

    Full Text Available This article presents the institutional frames for the acquisition of Polish literacy skills in Germany and the maintenance of Polish-German bilingualism after the repatriation of bilingual children to Poland. These processes are examined in the context of recent developments in the European domestic job market. While the European Union has placed proficiency in several languages among its educational objectives, and foreign languages have been made obligatory school subjects in all member countries, the potential advantages of internal European migrations for producing high-proficiency bilinguals are being ignored. Bilingualism resulting from migration and biculturalism enjoys little social prestige in the host countries. In Germany, there is significant regional variation in how school authorities react to challenges posed by the presence of minority languages. In many cases, the linguistic potential of many second-generation migrants and re-emigrants gets largely wasted because of lacking interest and incentives from German and Polish institutions alike.

  5. Sensing roughness and polish direction

    Science.gov (United States)

    Jakobsen, M. L.; Olesen, A. S.; Larsen, H. E.; Stubager, J.; Hanson, S. G.; Pedersen, T. F.; Pedersen, H. C.

    2016-04-01

    As a part of the work carried out on a project supported by the Danish council for technology and innovation, we have investigated the option of smoothing standard CNC machined surfaces. In the process of constructing optical prototypes, involving custom-designed optics, the development cost and time consumption can become relatively large numbers in a research budget. Machining the optical surfaces directly is expensive and time consuming. Alternatively, a more standardized and cheaper machining method can be used, but then the object needs to be manually polished. During the polishing process the operator needs information about the RMS-value of the surface roughness and the current direction of the scratches introduces by the polishing process. The RMS-value indicates to the operator how far he is from the final finish, and the scratch orientation is often specified by the customer in order to avoid complications during the casting process. In this work we present a method for measuring the RMS-values of the surface roughness while simultaneously determining the polishing direction. We are mainly interested in the RMS-values in the range from 0 - 100 nm, which corresponds to the finish categories of A1, A2 and A3. Based on simple intensity measurements we estimates the RMS-value of the surface roughness, and by using a sectioned annual photo-detector to collect the scattered light we can determine the direction of polishing and distinguish light scattered from random structures and light scattered from scratches.

  6. Inspection technique of latent flaws on fine polished glass substrates using stress-induced light scattering method

    Science.gov (United States)

    Sakata, Yoshitaro; Sakai, Kazufumi; Nonaka, Kazuhiro

    2014-05-01

    The fine polishing technique, e.g. Chemical Mechanical Polishing treatment (CMP), is one of the most important techniques in the glass substrate manufacturing. However, mechanical interaction, e.g. friction, occurs between the abrasive and the surface of substrates. Therefore, latent flaws are formed in the surfaces of glass substrates depending on the polishing condition. In the case of the cleaning process of the glass substrate in which the latent flaws existed, latent flaws become obvious because glass surfaces were eaten away by chemical interaction of cleaning liquid. Therefore, latent flaws are the cause of decrease the yield of products. In general, non-destructive inspection techniques, e.g. light scattering method, foreign matter on the surface of glass substrates. Though, it is difficult to detect the latent flaws by these method, because these are closed. The present authors propose a novel inspection technique of latent flaws which occurred by the fine polishing technique, using light scattering method with stress concentration (Stress-Induced Light scattering Method; SILSM). SILSM is possible to classify and separately detect latent flaws and particles on the surfaces. Samples are deformed by the actuator and stress concentrations are occurred around the tip of latent flaws. By photo-elastic effect, the refractive index of around the tip of latent flaws is changed. And then, changed refractive index is detected by cooled CCD camera as the light scattering intensity. In this report, applying SILSM to glass substrates, latent flaws on the surface of glass substrates are detected non-destructively, and the usefulness of SILSM is evaluated as novel inspection technique of latent flaws.

  7. New development of atmospheric pressure plasma polishing

    Institute of Scientific and Technical Information of China (English)

    Bo Wang; Jufan Zhang; Shen Dong

    2009-01-01

    Atmospheric pressure plasma polishing (APPP) is a precision machining technology used for manufacturing high quality optical surfaces. The changes of surface modulus and hardness after machining prove the distinct improvement of surface mechanical properties. The demonstrated decrease of surfacc residual stresses testifies the removal of the former deformation layer.And the surface topographies under atomic force microscope (AFM) and scanning electron microscope (SEM) indicate obvious amelioration of the surface status,showing that the 0.926-nm average surface roughness has been achieved.

  8. Polishing of dental porcelain by polycrystalline diamond.

    Science.gov (United States)

    Nakamura, Yoshiharu; Sato, Hideaki; Ohtsuka, Masaki; Hojo, Satoru

    2010-01-01

    Polycrystalline diamond (PCD) exhibits excellent abrasive characteristics and is commonly used as loose grains for precision machining of hard ceramics and other materials that are difficult to grind and polish. In the present study, we investigated using bonded PCD for polishing dental porcelain, for which a lustrous surface is difficult to obtain by polishing. We compared the surface texture and characteristics of dental porcelain after polishing with bonded PCD with that obtained using bonded monocrystalline diamond (MCD), which is commonly used for this purpose. Polishing was performed at various pressures and rotational speeds on a custom-built polishing apparatus using bonded PCD or MCD with grain sizes of 3.92 μm on specimens consisting of VITA Omega 900 dentin porcelain after firing and then glazing to a specified surface roughness. The surface roughness of the polished porcelain and the abrasion quantity in terms of its polishing depth were measured, and its surface texture and characteristics were investigated. At low polishing pressures, PCD yielded a finer polished surface than MCD. The polishing depth after polishing for 20-30 min was approximately 2-3 μm with PCD and 1-2 μm with MCD. The polished surface was more uniform and smooth with PCD than with MCD.

  9. Sensing roughness and polish direction

    DEFF Research Database (Denmark)

    Jakobsen, Michael Linde; Olesen, Anders Sig; Larsen, Henning Engelbrecht;

    2016-01-01

    needs information about the RMS-value of the surface roughness and the current direction of the scratches introduced by the polishing process. The RMS-value indicates to the operator how far he is from the final finish, and the scratch orientation is often specified by the customer in order to avoid...... complications during the casting process. In this work we present a method for measuring the RMS-values of the surface roughness while simultaneously determining the polishing direction. We are mainly interested in the RMS-values in the range from 0 – 100 nm, which corresponds to the finish categories of A1, A2...... and A3 (Finishing guide, Bales). Based on simple intensity measurements, we estimate the RMS-value of the surface roughness, and by using a sectioned annually shaped photo-detector to collect the scattered light, we can determine the direction of polishing and distinguish light scattered from random...

  10. (--Pentazocine induces visceral chemical antinociception, but not thermal, mechanical, or somatic chemical antinociception, in μ-opioid receptor knockout mice

    Directory of Open Access Journals (Sweden)

    Satoh Masamichi

    2011-04-01

    Full Text Available Abstract Background (--Pentazocine has been hypothesized to induce analgesia via the κ-opioid (KOP receptor, although the involvement of other opioid receptor subtypes in the effects of pentazocine remains unknown. In this study, we investigated the role of the μ-opioid (MOP receptor in thermal, mechanical, and chemical antinociception induced by (--pentazocine using MOP receptor knockout (MOP-KO mice. Results (--Pentazocine-induced thermal antinociception, assessed by the hot-plate and tail-flick tests, was significantly reduced in heterozygous and abolished in homozygous MOP-KO mice compared with wildtype mice. The results obtained from the (--pentazocine-induced mechanical and somatic chemical antinociception experiments, which used the hind-paw pressure and formalin tests, were similar to the results obtained from the thermal antinociception experiments in these mice. However, (--pentazocine retained its ability to induce significant visceral chemical antinociception, assessed by the writhing test, in homozygous MOP-KO mice, an effect that was completely blocked by pretreatment with nor-binaltorphimine, a KOP receptor antagonist. In vitro binding and cyclic adenosine monophosphate assays showed that (--pentazocine possessed higher affinity for KOP and MOP receptors than for δ-opioid receptors. Conclusions The present study demonstrated the abolition of the thermal, mechanical, and somatic chemical antinociceptive effects of (--pentazocine and retention of the visceral chemical antinociceptive effects of (--pentazocine in MOP-KO mice. These results suggest that the MOP receptor plays a pivotal role in thermal, mechanical, and somatic chemical antinociception induced by (--pentazocine, whereas the KOP receptor is involved in visceral chemical antinociception induced by (--pentazocine.

  11. Experimental Study on the Effects of Alumina Abrasive Particle Behavior in MR Polishing for MEMS Applications

    Directory of Open Access Journals (Sweden)

    Young-Jae Shin

    2008-01-01

    Full Text Available Recently, the magnetorheological (MR polishing process has been examined asa new ultra-precision polishing technology for micro parts in MEMS applications. In theMR polishing process, the magnetic force plays a dominant role. This method uses MRfluids which contains micro abrasives as a polishing media. The objective of the presentresearch is to shed light onto the material removal mechanism under various slurryconditions for polishing and to investigate surface characteristics, including shape analysisand surface roughness measurement, of spots obtained from the MR polishing process usingalumina abrasives. A series of basic experiments were first performed to determine theoptimum polishing conditions for BK7 glass using prepared slurries by changing the processparameters, such as wheel rotating speed and electric current. Using the obtained results,groove polishing was then performed and the results are investigated. Outstanding surfaceroughness of Ra=3.8nm was obtained on the BK7 glass specimen. The present resultshighlight the possibility of applying this polishing method to ultra-precision micro partsproduction, especially in MEMS applications.

  12. Graphite Composite Panel Polishing Fixture

    Science.gov (United States)

    Hagopian, John; Strojny, Carl; Budinoff, Jason

    2011-01-01

    The use of high-strength, lightweight composites for the fixture is the novel feature of this innovation. The main advantage is the light weight and high stiffness-to-mass ratio relative to aluminum. Meter-class optics require support during the grinding/polishing process with large tools. The use of aluminum as a polishing fixture is standard, with pitch providing a compliant layer to allow support without deformation. Unfortunately, with meter-scale optics, a meter-scale fixture weighs over 120 lb (.55 kg) and may distort the optics being fabricated by loading the mirror and/or tool used in fabrication. The use of composite structures that are lightweight yet stiff allows standard techniques to be used while providing for a decrease in fixture weight by almost 70 percent. Mounts classically used to support large mirrors during fabrication are especially heavy and difficult to handle. The mount must be especially stiff to avoid deformation during the optical fabrication process, where a very large and heavy lap often can distort the mount and optic being fabricated. If the optic is placed on top of the lapping tool, the weight of the optic and the fixture can distort the lap. Fixtures to support the mirror during fabrication are often very large plates of aluminum, often 2 in. (.5 cm) or more in thickness and weight upwards of 150 lb (68 kg). With the addition of a backing material such as pitch and the mirror itself, the assembly can often weigh over 250 lb (.113 kg) for a meter-class optic. This innovation is the use of a lightweight graphite panel with an aluminum honeycomb core for use as the polishing fixture. These materials have been used in the aerospace industry as structural members due to their light weight and high stiffness. The grinding polishing fixture consists of the graphite composite panel, fittings, and fixtures to allow interface to the polishing machine, and introduction of pitch buttons to support the optic under fabrication. In its

  13. Polishing compound for plastic surfaces

    Science.gov (United States)

    Stowell, Michael S.

    1995-01-01

    A polishing compound for plastic surfaces. The compound contains by weight approximately 4 to 17 parts at least one petroleum distillate lubricant, 1 to 6 parts mineral spirits, 2.5 to 15 parts abrasive particles, and 2.5 to 10 parts water. The abrasive is tripoli or a similar material that contains fine particles silica. Preferably, most of the abrasive particles are less than approximately 10 microns, more preferably less than approximately 5 microns in size. The compound is used on PLEXIGLAS.TM., LEXAN.TM., LUCITE.TM., polyvinyl chloride (PVC) and similar plastic materials whenever a smooth, clear polished surface is desired.

  14. Research and Development of Chemical Mechanical Planarization for Ge2Sb2Te5%Ge2Sb2Te5的化学机械抛光研究进展

    Institute of Scientific and Technical Information of China (English)

    何敖东; 刘波; 宋志棠; 冯高明; 朱南飞; 任佳栋; 吴关平; 封松林

    2013-01-01

    相变存储器由于具有非易失性、高速度、低功耗等优点被认为最有可能成为下一代存储器的主流产品,Ge2Sb2Te5 (GST)作为一种传统相变材料已经被广泛应用在相变存储器中,而GST的化学机械抛光作为相变存储器生产的关键工艺目前已被采用.本工作综述了有关GST的化学机械抛光技术研究进展,讨论了GST化学机械抛光过程的影响因素,如下压力、转速、抛光垫、磨料、氧化剂、表面活性剂等,并对目前GST的化学机械抛光机理进行了归纳,进一步展望了GST的化学机械抛光技术的发展前景.%Phase change memory (PCM) is considered a major candidate for next-generation memory due to its nonvolatile,fast program access times,low consumable power.So far chalcogenide Ge2Sb2Te5 (GST),as a traditional phase material,has been widely adopted and investigated for PCM application.Recently,chemical mechanical planarization (CMP) of GST as a key technique for confined structure has been applied in the fabrication of PCM.In this paper,research and development of CMP for GST is reviewed firstly and the impact factors of down force,rotation velocity,polishing pads,and the slurry on the GST CMP are discussed.For the mechanical parameter,the removal rate (RR) of GST increases with the increasing of pressure and rotation velocity firstly,and then reaches saturation or slightly decreases.The gentle mechanical parameter is a better choice for GST CMP due to its lower hardness.With regard to polishing pads,GST polished using Politex reg can attain a better surface quality,and almost no residue and scratches can be found,compared with IC1010.The oxidizer of slurry,such as H2O2,(NH4)2S2O8,KMnO4 and FeCl3 have a great influence on the GST performance,the oxidization capacity of each element in GST alloy is different.Among these elements,Ge is preferentially oxidized,but Te is hard oxidized due to their different electronegativity.RR strongly depends on the p

  15. The effect of time gaining on chemical composition and technological characteristics of mechanically separated turkey meat (MSM

    Directory of Open Access Journals (Sweden)

    Aneta Cegiełka

    2016-12-01

    Full Text Available Mechanically separated meat (MSM of poultry is a raw material widely used in the meat industry in Poland and most European Union countries. The manner and conditions for the production of this raw material cause, however, that it has limited technological usefulness. In this study the effect of time of obtaining turkey MSM produced by pressure separation on selected quality characteristics of this raw material: basic chemical composition, pH, thermal loss, water binding capacity and colour was determined. The experimental material consisted of MSM, which was collected directly from the machine after 1, 2 and 3 h of operation. The content of water, protein and fat in MSM was determined using a near infrared spectrometer. The instrumental measurement of colour parameters was performed in the CIE L*a*b* (1976 system. Determination of ash content in MSM and pH measurement were performed according to the requirements of Polish standards, and to determine other technological quality characteristics the methods described in the literature were used. It was found that the extension of working time of the pressure separator from 1 to 3 h resulted in a significant increase in the water content in turkey MSM. Furthermore, the MSM sample obtained after 3 h of operation of the device was characterized by a significantly lower thermal loss and higher water binding capacity than a similar material, but obtained after 1 and 2 h of operation of the device. Time of obtaining of turkey MOM had no significant effect on the content of protein, fat and ash, pH value and colour parameters (L*, a*, b* of the raw material.

  16. Influence of Duroc breed inclusion into Polish Landrace maternal line on pork meat quality traits.

    Science.gov (United States)

    Guzek, Dominika; Głąbska, Dominika; Głąbski, Krzysztof; Wierzbicka, Agnieszka

    2016-05-31

    Crossbreeding with Duroc breed allows to improve meat quality, but no data is available regarding specific influence of Duroc breed on characteristics of meat in the case of crossbreeding with various breeds. The aim of the present research was to evaluate the effect of crossbreeding Polish Landrace dames with Duroc sires on quality features of meat in reference to Polish Landrace breed. The objects of the study were Longissimus dorsi lumborum pork muscles obtained from Polish Landrace breed and Polish Landrace x Duroc crossbreed animals. Sarcomere length measurements were conducted using microscopic method and basic chemical composition measurement was analyzed using spectrophotometric scanning. Texture analysis of meat samples, performed after thermal treatment was expressed by Warner-Bratzler shear force and color analysis was obtained using CIE L*a*b* color system. No differences in sarcomere length, shear force as well as components of color values between pork meat originated from Polish Landrace breed and Polish Landrace x Duroc crossbreed were observed. Analysis of basic chemical composition revealed higher fat and lower ash contents in the case of meat of Polish Landrace breed animals. It was concluded that the actual impact of breed on meat characteristics is possibly altered by other factors. It may be suggested that influence of basic chemical composition on color of meat is breed-related.

  17. Semiological analysis of Polish theater posters

    OpenAIRE

    Jelena Nikolić; Uroš Nedeljković

    2016-01-01

    Through the application of semiological analysis to theater posters made by two Polish authors, the paper uncovers signs, meanings, codes and specifics of the „Polish school of poster-making“ and contemporary Polish posters. Aside from this, I suggest a methodological framework for studying the issue of coding and shaping a theater poster as a culturally specific form of visual communication. The aesthetic and semiotic outlook of the Polish theater posters which were chosen is analyzed using ...

  18. Research on a mechanical polishing method for stainless steel electric kettle surface%不锈钢电水壶曲面机械抛光方法研究

    Institute of Scientific and Technical Information of China (English)

    吴昌林; 范青荣; 耿金龙; 金逸

    2011-01-01

    为解决不锈钢电热水壶在手工抛光方式中存在的污染严重、抛光效率低和质量不稳定等问题,成功自主研发了一套电水壶曲面自动化机械抛光系统,该系统采用了多磨具多工位的抛光方法,可夹持三个水壶同时进行抛光,提高了抛光效率.为确保水壶表面抛光质量,规划了螺旋式刀具路径,同时提出了基于示教法的抛光刀位数据生成方法,并利用NURBS曲线拟合的方法对刀具轨迹进行优化.实验结果证明,与手工抛光方式相比较,该方法大大提高了抛光质量和效率.%To resolve the problems of manual polishing for stainless steel electric kettle,such as,serious pollution, low efficiency and unstable quality,an automatic polishing system for stainless steel electric kettle surface was successfully developed.The system adopted the method of multi-abrasive and multi-station, which can polish three kettles in a time and improve the polishing efficiency; making sure of the polishing quality of kettle surface,the spiral tool path was planed,meanwhile a method of data generating for cutter location with teaching method was recommended and a method of optimal path engendered with NURBS curve fitting was used to optimize the tool path.The experimental result proves that this method can produce higher polishing quality and efficiency compared with manual polishing.

  19. Polish-Bulgarian-Russian, Bulgarian-Polish-Russian or Russian-Bulgarian-Polish dictionary?

    Directory of Open Access Journals (Sweden)

    Violetta Koseska-Toszewa

    2015-11-01

    Full Text Available Polish-Bulgarian-Russian, Bulgarian-Polish-Russian or Russian-Bulgarian-Polish dictionary? The trilingual dictionary (M. Duszkin, V. Koseska, J. Satoła and A. Tzoneva is being elaborated based on a working Polish-Bulgarian-Russian electronic parallel corpus authored by Maksim Duszkin, Violetta Koseska-Toszewa and Joanna Satoła-Staśkowiak, and works by A. Tzoneva. It is the first corpus comparing languages belonging to three different Slavic language groups: western, southern and eastern. Works on the dictionary are based on Gramatyka konfrontatywna bułgarsko-polska (Bulgarian-Polish confrontative grammar and the proposed there semantic-oriented interlanguage. Two types of classifiers have been introduced into the dictionary: classic and semantic. The trilingual dictionary will present a consistent and homogeneous set of facts of grammar and semantics. The Authors point out that in a traditional dictionary it is not clear for example whether aspect should be understood as imperfective / perfective form of a verb or as its meaning. Therefore in the dictionary forms and meaning are separated in a regular way. Imperfective verb form has two meanings: state and configuration of states and events culminating in state. Also perfective verb form has two meanings: event and configuration of states and events culminating in event. These meanings are described by the semantic classifiers, respectively, state and event, state1 and event1. The way of describing language units, mentioned in the article, gives a possibility to present language material (Polish, Bulgarian, Russian in any required order, hence the article’s title.

  20. New examples of small Polish structures

    OpenAIRE

    Dobrowolski, Jan

    2013-01-01

    We answer some questions from a paper of Krupi\\'nski by giving suitable examples of small Polish structures. First, we present a class of small Polish group structures without generic elements. Next, we construct a first example of a small non-zero-dimensional Polish $G$-group.

  1. An Investigation on a Tin Fixed Abrasive Polishing Pad with Phyllotactic Pattern for Polishing Wafer

    Institute of Scientific and Technical Information of China (English)

    吕玉山; 刘电飞; 寇智慧

    2012-01-01

    In order to improve the polishing ability of polishing pads, a kind of polishing pad with the tin fixed abrasive blocks, which are arranged based on the phyllotaxis theory of biology, was designed and fabricated by the use of electroplating technology, and also its polishing ability for JGS-2 wafer was investigated by polishing experiments. The research resuits show that the phyllotactic parameters of the polishing pad influence the arrangement density of the tin fixed abrasive blocks, the polishing pad with phyllotactic pattern is feasibly fabricated by the use of electroplating technology, and the good polishing result can be obtained by using the polishing pad with pbyllotactic pattern to polish a wafer when the diameter D of the tin fixed abrasive block is between Φ. 3 mm and Φ1. 4 mm, and the phyllotactic coefficient k between 1.0 and 1.1, respectively.

  2. Quantum chemical aided prediction of the thermal decomposition mechanisms and temperatures of ionic liquids

    Energy Technology Data Exchange (ETDEWEB)

    Kroon, Maaike C. [Physical Chemistry and Molecular Thermodynamics, Department of Chemical Technology, Faculty of Applied Sciences, Delft University of Technology, Julianalaan 136, 2628 BL Delft (Netherlands); Process Equipment, Department of Process and Energy, Faculty of Mechanical, Maritime and Materials Engineering, Delft University of Technology, Leeghwaterstraat 44, 2628 CA Delft (Netherlands)], E-mail: maaike.kroon@gmail.com; Buijs, Wim [Catalysis Engineering, Department of Chemical Technology, Faculty of Applied Sciences, Delft University of Technology, Julianalaan 136, 2628 BL Delft (Netherlands); Peters, Cor J. [Physical Chemistry and Molecular Thermodynamics, Department of Chemical Technology, Faculty of Applied Sciences, Delft University of Technology, Julianalaan 136, 2628 BL Delft (Netherlands); Witkamp, Geert-Jan [Process Equipment, Department of Process and Energy, Faculty of Mechanical, Maritime and Materials Engineering, Delft University of Technology, Leeghwaterstraat 44, 2628 CA Delft (Netherlands)], E-mail: G.J.Witkamp@3me.tudelft.nl

    2007-12-15

    The long-term thermal stability of ionic liquids is of utmost importance for their industrial application. Although the thermal decomposition temperatures of various ionic liquids have been measured previously, experimental data on the thermal decomposition mechanisms and kinetics are scarce. It is desirable to develop quantitative chemical tools that can predict thermal decomposition mechanisms and temperatures (kinetics) of ionic liquids. In this work ab initio quantum chemical calculations (DFT-B3LYP) have been used to predict thermal decomposition mechanisms, temperatures and the activation energies of the thermal breakdown reactions. These quantum chemical calculations proved to be an excellent method to predict the thermal stability of various ionic liquids.

  3. Investigation of opening switch mechanisms based on chemically reactive plasmas

    Science.gov (United States)

    Lapatovich, W. P.; Piejak, R. B.; Proud, J. M.

    1985-11-01

    An investigation of discharge-induced chemical reactions resulting in high-density product vapors containing strongly attaching gases has been conducted to evaluate the feasibility and potential of such reactions in rapid opening plasma switches. This new concept of employing such reactions to limit and/or interrupt large currents on a microsecond time scale was studied in two element (electrodeless and electroded) devices and in three element (electroded) devices. Bimolecular and unimolecular reactions were considered. The plasma reaction between AlCl sub 3 and SiO sub 2 was studied. The electrical properties of one of the reaction products (SiCl sub 4) is reported.

  4. Investigation of Chemical Durability Mechanism in Fluoride Glasses

    Science.gov (United States)

    1985-12-01

    exhibiting the higher normalized leach rates. The addition of Na and Al to form the ZBLAN glass (Fig. 2C) in- creases the corrosion rate of all of the...leach rates vs. time from leachate anal- ysis for individual elements of glasses : (A) ZBLAL; (B) ZBLALPb; (C) ZBLAN . Figure 3: Compositionally...eel0angInvestigation of Chemical Durability flechanis s iR Fluoride Glasses . 12. PERSONAL AUTO*ORISI Catherine J. Simmons and Joseph H. Simmons 13& TYPEV Of RP-ORT 113

  5. Effect of Chemical Corrosion on the Mechanical Characteristics of Parent Rocks for Nuclear Waste Storage

    Directory of Open Access Journals (Sweden)

    Tielin Han

    2016-01-01

    Full Text Available Long-term immersion was adopted to explore the damage deterioration and mechanical properties of granite under different chemical solutions. Here, granite was selected as the candidate of parent rocks for nuclear waste storage. The physical and mechanical properties of variation regularity immersed in various chemical solutions were analyzed. Meanwhile, the damage variable based on the variation in porosity was used in the quantitative analysis of chemical damage deterioration degree. Experimental results show that granite has a significant weakening tendency after chemical corrosion. The fracture toughness KIC, splitting tensile strength, and compressive strength all demonstrate the same deteriorating trend with chemical corrosion time. However, a difference exists in the deterioration degree of the mechanical parameters; that is, the deterioration degree of fracture toughness KIC is the greatest followed by those of splitting tensile strength and compressive strength, which are relatively smaller. Strong acid solutions may aggravate chemical damage deterioration in granite. By contrast, strong alkaline solutions have a certain inhibiting effect on chemical damage deterioration. The chemical solutions that feature various compositions may have different effects on chemical damage degree; that is, SO42- ions have a greater effect on the chemical damage in granite than HCO3- ions.

  6. In-situ photopatterning of hydrogel microarrays in polished microchips

    NARCIS (Netherlands)

    Gumuscu, Burcu; Berg, van den Albert; Eijkel, Jan C.T.

    2015-01-01

    We present a fabrication method which enables simple and eproducible photopatterning of micron- sized hydrogel arrays inside closed microchips. To achieve this, the glass cover of the microchip is thinned by mechanical grinding and polishing. This procedure reduces the spacing between the photomask

  7. Chemical amplifier, self-ignition mechanism, and amoeboid cell migration

    Science.gov (United States)

    Schienbein, M.; Gruler, H.

    1995-10-01

    The signal transduction chain of amoeboid migrating cells, such as human granulocytes, is approximated. Only the mean concentration of intracellular messenger molecules is considered. The weak cellular input signal originating from membrane-bound receptors occupied by molecules that stimulate migration steers a large flux of energy and mass. The strong second intracellular signal is produced by a chemical amplifier. Several functions are performed by this second intracellular signal: (i) the activation of the microfilaments (linear motor), (ii) the renewal of the membrane-bound receptors, and (iii) the alteration of the input characteristics of the chemical amplifier. The rate equation for the second messenger is derived. The solution of this machine equation is compared with experimental results. The chemokinetic dose-response curve, as well as a machine cycle, are predicted. A threshold concentration of the migration-stimulating molecules is predicted. At high concentrations, the cells are in an activated state with self-maintained oscillations of the second intracellular messenger, and at low concentrations, the cells are in an inactivated state without oscillations. The migration-stimulated cells are compared to a laser.

  8. Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0 0 0 1)

    Energy Technology Data Exchange (ETDEWEB)

    Shi, Xiaolei [The State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Pan, Guoshun, E-mail: pangs@tsinghua.edu.cn [The State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China); Zhou, Yan; Gu, Zhonghua; Gong, Hua; Zou, Chunli [The State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China); Shenzhen Key Laboratory of Micro/Nano Manufacturing, Research Institute of Tsinghua University in Shenzhen, Shenzhen 518057 (China)

    2014-07-01

    In this paper, a detailed analysis is presented to characterize the performance of colloidal silica abrasives based slurry with different abrasive sizes on CMP of hexagonal 4H-SiC wafer, and indicates that the abrasive size is an important factor to determine the efficiency of CMP and the final planarization quality of wafer surface. The authors also present a detailed hypothesis to describe the material removal mechanism of 4H-SiC by colloidal silica abrasives during CMP process, and design two groups of experiments to demonstrate the rationality of the hypothesis. Furthermore, the authors put forward some suggestions to optimize the CMP efficiency and planarization quality of 4H-SiC wafer.

  9. Effects of Chairside Polishing and Brushing on Surface Roughness of Acrylic Denture Base Resins

    Institute of Scientific and Technical Information of China (English)

    Seung-Kyun Kim; Ju-Mi Park; Min-Ho Lee; Jae-Youn Jung; Shipu Li; Xinyu Wang

    2009-01-01

    The effects of 3 chairside polishing kits and mechanical brushing on the surface roughness of 3 different acrylic denture base resins were compared. Acrylic denture base resins (auto-polymerizing, heat-polymerizing, injected heat-polymerizing resins) were examined after a tungsten carbide bur, and after chairside polishing using 3 polishing kits and pumice. The specimens were subjected to mechanical brushing using a wear tester to simulate 30 000 strokes of brushing. The surface roughness of the acrylic denture base resin specimens was measured using a contact pro-filometer. After the test, the random polished acrylic resins were evaluated by scanning electron mi-croscopy (SEM) and atomic force microscopy (AFM). Acrylic denture base resins polished using the 3 types of polishing kits had a smoother surface than those finished with the tungsten carbide bur (p <0.05). The surface of the resin polished by a TC cutter exceeded the Ra of 0.2 μm (p<0.05). The auto-polymerizing resin showed a significantly higher surface roughness than the heat-polymerizing resin and injected heat-polymerizing resin (p>0.05). In the case of polishing step wise, there was almost no change in surface roughness after brushing (p>0.05).

  10. Mechanisms in endogenous leukemia virus induction by radiation and chemicals

    Energy Technology Data Exchange (ETDEWEB)

    Tennant, R.W.; Rascati, R.J.; Lavelle, G.C.

    1976-01-01

    A model of endogenous leukemia virus induction in AKR strain mouse cells based on two distinct types of alterations in cellular or proviral DNA is presented. The first type are non-repairable alterations, such as those caused by the incorporation of halogenated pyrimidines; the second type are repairable lesions, such as those caused by irradiation or certain other chemicals. The production of non-repairable lesions leads to the formation of a stable, proviral state which is dependent upon cell division for complete virus expression. A stable provirus intermediate state is not demonstrable in cells induced by treatments which cause repairable lesions, since replication of damaged or altered DNA must occur before the lesions are removed by repair synthesis. Experimental support for this model is presented.

  11. Mechanical behavior of chemically treated Jute/Polymer composites

    Directory of Open Access Journals (Sweden)

    Murali B

    2014-03-01

    Full Text Available Fiber which serves as a reinforcement in reinforced plastics may be synthetic or natural past studies show that only artificial fibers such as glass, carbon etc., have been used in fiber reinforced plastics. Although glass and other synthetic fiber reinforced plastics possess high specific strength, their fields of application are very limited because of their inherent higher cost of production. In this connection, an investigation has been carried out to make use of jute , a natural fiber abundantly available in India. Natural fibers are not only strong and lightweight but also relatively very cheap. In the present work, jute composites are developed and their mechanical properties are evaluated. Mechanical properties of jute/polymer and compared with glass fiber/epoxy. These results indicate that jute can be used as a potential reinforcing material for making low load bearing thermoplastic composites.

  12. A hypothesis on chemical mechanism of the effect of hydrogen

    Directory of Open Access Journals (Sweden)

    Shi Penghui

    2012-06-01

    Full Text Available Abstract Many studies have shown that hydrogen can play important roles on the antioxidant, anti-inflammatory and other protective effects. Ohsawa et al have proved that hydrogen can electively and directly scavenge hydroxyl radical. But this mechanism cannot explain more new experimental results. In this article, the hypothesis, which is inspired by H2 could bind to the metal as a ligand, come up to explain its extensive biology effect: Hydrogen could regulate particular metalloproteins by bonding (M–H2 interaction it. And then it could affect the metabolization of ROS and signal transduction. Metalloproteins may be ones of the target molecules of H2 action. Metal ions may be appropriate role sites for H2 molecules. The hypothesis pointed out a new direction to clarify its mechanisms.

  13. Development of Application of RE Polishing Materials

    Institute of Scientific and Technical Information of China (English)

    Li Xueshun; Huang Shaodong; Yang Guosheng

    2004-01-01

    The manufacturing method and functions of the RE polishing powder and comparation of the current situation of its production and application home and abroad were introduced.By analyzing the development of the liquid crystal (plate) display, the wide application of the RE polishing powder in the field of the liquid crystal display and predicts the development direction of the market of the RE polishing powder was presented.In addition, the development trends of the RE polishing powder industry and forecasts the application prospect of the RE polishing powder was analyzed.

  14. 3D thermo-chemical-mechanical analysis of the pultrusion process

    DEFF Research Database (Denmark)

    Baran, Ismet; Hattel, Jesper Henri; Tutum, Cem C.

    2013-01-01

    In the present study, a 3D Eulerian thermo-chemical analysis is sequentially coupled with a 3D Lagrangian quasi static mechanical analysis of the pultrusion process. The temperature and degree of cure profiles at the steady state are first calculated in the thermo-chemical analysis...

  15. Chemical kinetic mechanism for the oxidation of paraffinic hydrocarbons needed for primary reference fuels

    Energy Technology Data Exchange (ETDEWEB)

    Westbrook, C.K.; Pitz, W.J.

    1993-03-01

    A detailed chemical kinetic reaction mechanism is described which simulates the oxidation of the primary reference fuels n-heptane and iso-octane. The high temperature subset of these mechanisms is identified, and the extensions to deal with low temperature conditions are also explained. The algorithms used to assign reaction rates to elementary steps in the reaction mechanism are described, and the means of identifying the different chemical species and the relevant reactions are outlined. Finally, we show how interested kinetic modeling researchers can obtain copies of this reaction mechanism.

  16. Development of a Procedure to Apply Detailed Chemical Kinetic Mechanisms to CFD Simulations as Post Processing

    DEFF Research Database (Denmark)

    Skjøth-Rasmussen, Martin Skov; Glarborg, Peter; Jensen, Anker;

    2003-01-01

    It is desired to make detailed chemical kinetic mechanisms applicable to the complex geometries of practical combustion devices simulated with computational fluid dynamics tools. This work presents a novel general approach to combining computational fluid dynamics and a detailed chemical kinetic...... mechanism. It involves post-processing of data extracted from computational fluid dynamics simulations. Application of this approach successfully describes combustion chemistry in a standard swirl burner, the so-called Harwell furnace. Nevertheless, it needs validation against more complex combustion models...

  17. Quantum-Mechanical Definition of Atoms and Chemical Bonds in Molecules

    Science.gov (United States)

    2015-01-01

    AFRL-RQ-ED-TR-2014-0025 Quantum-Mechanical Definition of Atoms and Chemical Bonds in Molecules P.W. Langhoff J.D. Mills J.A...manufacture, use, or sell any patented invention that may relate to them. Qualified requestors may obtain copies of this report from the Defense...DATES COVERED (From - To) 15 Oct 2013 - 15 Oct 2014 4. TITLE AND SUBTITLE Quantum-Mechanical Definition of Atoms and Chemical Bonds in Molecules

  18. Evaluation of the surface roughness in dental ceramics submitted to different finishing and polishing methods.

    Science.gov (United States)

    Vieira, Alex C; Oliveira, Mario C S; Lima, Emilena M C X; Rambob, Isabel; Leite, Mariana

    2013-09-01

    Ceramic restorations have been widely used in dentistry. These restorations often require intraoral adjustment with diamond burs after their cementation causing increasing roughness of the ceramic surface. Consequently some finishing and polishing methods have been used to minimize this occurrence. The aim of this study is to evaluate the roughness of the ceramic surfaces submitted to different finishing and polishing methods. 144 specimens of VITAVM(®)7, VM(®)9 and VM(®)13 (VITA Zahnfabrik) ceramics were fabricated and submitted to grinding using diamond burs. They were then divided into 15 groups (five of each ceramic type). Groups 1, 6 and 11-positive control (Glaze); Groups 2, 7 and 12-negative control (no polishing); Groups 3, 8 and 13-polished with abrasive rubbers (Edenta), felt disc and diamond polishing past; Groups 4, 9 and 14-polished with abrasive rubbers (Shofu), felt disc and diamond polishing past; Groups 5, 10 and 15-polished with aluminum oxide discs (Sof-Lex, 3M-ESPE), felt disc and diamond polishing paste. The roughness of the samples surfaces were measured using the rugosimeter Surfcorder SE 1700 and the data were submitted to statistical analysis using ANOVA and Tukey test at a level of significance of 5 %. There was statistically significance difference between the positive control groups and the other groups in all the ceramic types. Mechanical finishing and polishing methods were not able to provide a surface as smooth as the glazed surface for the tested ceramics. To assist dental practitioners to select the best finishing and polishing methods for the final adjustment of the ceramic restorations.

  19. Chemical and mechanical control of corrosion product transport

    Energy Technology Data Exchange (ETDEWEB)

    Hede Larsen, O.; Blum, R. [I/S Fynsvaerket, Faelleskemikerne, Odense (Denmark); Daucik, K. [I/S Skaerbaekvaerket, Faelleskemikerne, Fredericia (Denmark)

    1996-12-01

    The corrosion products formed in the condensate and feedwater system of once-through boilers are precipitated and deposited inside the evaporator tubes mainly in the burner zone at the highest heat flux. Depositions lead to increased oxidation rate and increased metal temperature of the evaporator tubes, hereby decreasing tube lifetime. This effect is more important in the new high efficiency USC boilers due to increased feedwater temperature and hence higher thermal load on the evaporator tubes. The only way to reduce the load on the evaporator tubes is to minimise corrosion product transport to the boiler. Two general methods for minimising corrosion product transport to the boiler have been evaluated through measurement campaigns for Fe in the water/steam cycle in supercritical boilers within the ELSAM area. One method is to reduce corrosion in the low temperature condensate system by changing conditioning mode from alkaline volatile treatment (AVT) to oxygenated treatment (OT). The other method is to filtrate part of the condensate with a mechanical filter at the deaerator. The results show, that both methods are effective at minimising Fe-transport to the boiler, but changing to OT has the highest effect and should always be used, whenever high purity condensate is maintained. Whether mechanical filtration also is required, depends on the boiler, specifically the load on the evaporator. A simplified calculation model for lifetime evaluation of evaporator tubes has been developed. This model has been used for evaluating the effect of corrosion product transport to the boiler on evaporator tube lifetime. Conventional supercritical boilers generally can achieve sufficient lifetime by AVT and even better by OT, whereas all measures to reduce Fe-content of feedwater, including OT and mechanical filtration, should be taken, to ensure sufficient lifetime for the new boilers with advanced steam data - 290 bar/580 deg. C and above. (au)

  20. Chemical and mechanical properties of surfaces on the nanoscale

    Science.gov (United States)

    Broz, Margaret Elizabeth

    This research investigated the chemical and physical properties of materials on the nanoscale. Combinatorial atomic layer deposition was used to deposit conformal films with compositional gradients from 100% aluminum oxide to 100% zinc oxide. The films were characterized using ellipsometry, scanning electron microscopy and Auger electron spectroscopy to determine their thickness and composition, respectively. Atomic layer deposition was confirmed individually for aluminum oxide and zinc oxide. Combinatorial experiments confirmed the etching of ZnO by the trimethyl aluminum precursor, which was compensated for by adjusting the pulse sequence. Thin diamond-like carbon films were studied using scanning probe microscopy techniques (atomic force microscopy, friction force microscopy, digital pulsed force mode atomic force microscopy) and a method for quantifying the friction coefficient of these films was refined. Friction forces and the friction coefficient were measured for diamond-like carbon films over a range of relative humidity values and hysteresis effects were also studied. The adhesion changes due to fluorinated lubricant top coats on the diamond-like carbon were studied using digital pulsed force mode atomic force microscopy over a range of relative humidity values. Special diamond-like carbon coated tips were used in both sets of experiments to simulate the head-disk interaction between the slider and media in hard disk drive systems. Monodisperse oleic acid-capped lead selenide nanocrystals were synthesized using a modified hot injection method. Size-tunable nanocrystals were obtained by adjusting synthetic parameters. Nanocrystals were analyzed using X-ray diffraction, absorbance spectroscopy and UV-Visible spectroscopy. Organic ligands were also synthesized and used in ligand exchange experiments. Drop cast films of the nanocrystals with new ligands showed some change in FTIR peak position.

  1. Mechanisms of environmental chemicals that enable the cancer hallmark of evasion of growth suppression

    Science.gov (United States)

    Nahta, Rita; Al-Mulla, Fahd; Al-Temaimi, Rabeah; Amedei, Amedeo; Andrade-Vieira, Rafaela; Bay, Sarah; G. Brown, Dustin; Calaf, Gloria M.; Castellino, Robert C.; Cohen-Solal, Karine A.; Colacci, Annamaria; Cruickshanks, Nichola; Dent, Paul; Di Fiore, Riccardo; Forte, Stefano; Goldberg, Gary S.; Hamid, Roslida A.; Krishnan, Harini; Laird, Dale W.; Lasfar, Ahmed; Marignani, Paola A.; Memeo, Lorenzo; Mondello, Chiara; Naus, Christian C.; Ponce-Cusi, Richard; Raju, Jayadev; Roy, Debasish; Roy, Rabindra; P. Ryan, Elizabeth; Salem, Hosni K.; Scovassi, A. Ivana; Singh, Neetu; Vaccari, Monica; Vento, Renza; Vondráček, Jan; Wade, Mark; Woodrick, Jordan; Bisson, William H.

    2015-01-01

    As part of the Halifax Project, this review brings attention to the potential effects of environmental chemicals on important molecular and cellular regulators of the cancer hallmark of evading growth suppression. Specifically, we review the mechanisms by which cancer cells escape the growth-inhibitory signals of p53, retinoblastoma protein, transforming growth factor-beta, gap junctions and contact inhibition. We discuss the effects of selected environmental chemicals on these mechanisms of growth inhibition and cross-reference the effects of these chemicals in other classical cancer hallmarks. PMID:26106139

  2. Thinning and polishing of cross-section of depth-graded WSi2/Si multilayer for linear zone plate application

    Institute of Scientific and Technical Information of China (English)

    Qiushi Huang; Jingtao Zhu; Haochuan Li; Zhengxiang Shen; Xiaoqiang Wang; Zhanshan Wang; Yongjian Tang

    2012-01-01

    A linear zone plate named multilayer laue lens (MLL) is fabricated using a depth-graded multilayer structure.The lens shows considerable potential in focusing an X-ray beam into a nanometer scale with high efficiency.In this letter,a depth-graded multilayer consisting of 324 alternating WSi2 and Si layers with a total thickness of 7.9 μm is deposited based on the thickness sequence according to the demands of the zone plate law. Subsequently,the multilayer sample is sliced and thinned to an ideal depth along the cross-section direction using raw abrasives and diamond lapping.Finally,the cross-section is polished by a chemical mechanical polishing (CMP) technique to remove the damages and improve the surface smoothness. The final depth of the MLL is approximately 7 μm with an achieved aspect ratio greater than 400. Results of scanning electron microscopy (SEM) and atomic force microscopy (AFM) indicate that interfaces are sharp,and the multilayer structure remains undamaged after the thinning and polishing processes.The surface roughness achieved is 0.33 nm.

  3. Electrochemical behavior and polishing properties of silicon wafer in alkaline slurry with abrasive CeO2

    Institute of Scientific and Technical Information of China (English)

    SONG Xiao-lan; XU Da-yu; ZHANG Xiao-wei; SHI Xun-da; JIANG Nan; QIU Guan-zhou

    2008-01-01

    The electrochemical behavior of silicon wafer in alkaline slurry with nano-sized CeO2 abrasive was investigated. The variations of corrosion potential (φcorr) and corrosion current density (Jcorr) of the P-type (100) silicon wafer with the slurry pH value and the concentration of abrasive CeO2 were studied by polarization curve technologies. The dependence of the polishing rate on the pH and the concentration of CeO2 in slurries during chemical mechanical polishing(CMP) were also studied. It is discovered that there is a large change of φcorr and Jcorr when slurry pH is altered and the Jcorr reaches the maximum (1.306 μA/cm2) at pH 10.5 when the material removal rate(MRR) comes to the fastest value. The Jcorr increases gradually from 0.994 μA/cm2 with 1% CeO2 to 1.304 μA/cm2 with 3% CeO2 and reaches a plateau with the further increase of CeO2 concentration. There is a considerable MRR in the slurry with 3% CeO2 at pH 10.5. The coherence between Jcorr and MRR elucidates that the research on the electrochemical behavior of silicon wafers in the alkaline slurry could offer theoretic guidance on silicon polishing rate and ensure to adjust optimal components of slurry.

  4. Effects of Hygrothermal Cycling on the Chemical, Thermal, and Mechanical Properties of 862/W Epoxy Resin

    Science.gov (United States)

    Miller, Sandi G.; Roberts, Gary D.; Copa, Christine C.; Bail, Justin L.; Kohlman, Lee W.; Binienda, Wieslaw K.

    2011-01-01

    The hygrothermal aging characteristics of an epoxy resin were characterized over 1 year, which included 908 temperature and humidity cycles. The epoxy resin quickly showed evidence of aging through color change and increased brittleness. The influence of aging on the material s glass transition temperature (Tg) was evaluated by Differential Scanning Calorimetry (DSC) and Dynamic Mechanical Analysis (DMA). The Tg remained relatively constant throughout the year long cyclic aging profile. The chemical composition was monitored by Fourier Transform Infrared Spectroscopy (FTIR) where evidence of chemical aging and advancement of cure was noted. The tensile strength of the resin was tested as it aged. This property was severely affected by the aging process in the form of reduced ductility and embrittlement. Detailed chemical evaluation suggests many aging mechanisms are taking place during exposure to hygrothermal conditions. This paper details the influence of processes such as: advancement of cure, chemical degradation, and physical aging on the chemical and physical properties of the epoxy resin.

  5. Water effect on peroxy radical measurement by chemical amplification: Experimental determination and chemical mechanism

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    The water effect on peroxy radical measurement by chemical amplification was determined experimentally for HO2 and HO2+OH, respectively at room temperature (298±2) K and atmospheric pressure (1×105 Pa). No significant difference in water effect was observed with the type of radicals. A theoretical study of the reaction of HO2·H2O adduct with NO was performed using density functional theory at CCSD(T)/6-311 G(2d, 2p)//B3LYP/6-311 G(2d, 2p) level of theory. It was found that the primary reaction channel for the reaction is HO2·H2O+NO→HNO3+H2O (R4a). On the basis of the theoretical study, the rate constant for (R4a) was calculated using Polyrate Version 8.02 program. The fitted Arrenhnius equation for (R4a) is k = 5.49×107 T 1.03exp(?14798/T) between 200 and 2000 K. A chemical model incorporated with (R4a) was used to simulate the water effect. The water effect curve obtained by the model is in accordance with that of the experiment, suggesting that the water effect is probably caused mainly by (R4a).

  6. Water effect on peroxy radical measurement by chemical amplification: Experimental determination and chemical mechanism

    Institute of Scientific and Technical Information of China (English)

    QI Bin; LIU Lu; CHAO YuTao; WANG ZhuQing; YANG HongYan

    2008-01-01

    The water effect on peroxy radical measurement by chemical amplification was determined experi-mentally for HO2 and HO2+OH, respectively at room temperature (298+9) K and atmospheric pressure (1×105 Pa). No significant difference in water effect was observed with the type of radicals. A theoretical study of the reaction of HO2. H2O adduct with NO was performed using density functional theory at CCSD(T)/6-311 G(2d, 2p)//B3LYPI6-311 G(2d, 2p) level of theory. It was found that the primary reaction channel for the reaction is HO2. H2O+NO→HNO3+H2O (R4a). On the basis of the theoretical study, the rate constant for (R4a) was calculated using Polyrate Version 8.02 program. The fitted Arrenhnius equation for (R4a) is k=5.49×107 T1.03exp(-14798/T) between 200 and 2000 K. A chemical model in-corporated with (R4a) was used to simulate the water effect. The water effect curve obtained by the model is in accordance with that of the experiment, suggesting that the water effect is probably caused mainly by (R4a).

  7. Energy savings in Polish buildings

    Energy Technology Data Exchange (ETDEWEB)

    Markel, L.C.; Gula, A.; Reeves, G.

    1995-12-31

    A demonstration of low-cost insulation and weatherization techniques was a part of phase 1 of the Krakow Clean Fossil Fuels and Energy Efficient Project. The objectives were to identify a cost-effective set of measures to reduce energy used for space heating, determine how much energy could be saved, and foster widespread implementation of those measures. The demonstration project focused on 4 11-story buildings in a Krakow housing cooperative. Energy savings of over 20% were obtained. Most important, the procedures and materials implemented in the demonstration project have been adapted to Polish conditions and applied to other housing cooperatives, schools, and hospitals. Additional projects are being planned, in Krakow and other cities, under the direction of FEWE-Krakow, the Polish Energie Cities Network, and Biuro Rozwoju Krakowa.

  8. Successful intervention in a child with toxic methemoglobinemia due to nail polish remover poisoning

    Directory of Open Access Journals (Sweden)

    Soumya Patra

    2011-01-01

    Full Text Available Children are most susceptible to accidental exposure of common household substances and one of the common household substances is nail polish remover. We are presenting a case of accidental ingestion of nail polish remover with lethal methemoglobinemia (serum methemoglobin level-72%. This patient was treated successfully with injection methylene blue. However, even small amounts can be dangerous to children, so it is important to keep this and all household chemicals in a safe place

  9. Parameter Optimization for Laser Polishing of Niobium for SRF Applications

    Energy Technology Data Exchange (ETDEWEB)

    Zhao, Liang [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States) and William and Mary College, Williamsburg, VA (United States); Klopf, John Michael [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Reece, Charles E. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Kelley, Michael J. [Thomas Jefferson National Accelerator Facility, Newport News, VA (United States) and William and Mary College, Williamsburg, VA (United States)

    2013-06-01

    Surface smoothness is critical to the performance of SRF cavities. As laser technology has been widely applied to metal machining and surface treatment, we are encouraged to use it on niobium as an alternative to the traditional wet polishing process where aggressive chemicals are involved. In this study, we describe progress toward smoothing by optimizing laser parameters on BCP treated niobium surfaces. Results shows that microsmoothing of the surface without ablation is achievable.

  10. Stress polishing demonstrator for ELT M1 segments and industrialization

    Science.gov (United States)

    Hugot, Emmanuel; Bernard, Anaïs.; Laslandes, Marie; Floriot, Johan; Dufour, Thibaut; Fappani, Denis; Combes, Jean Marc; Ferrari, Marc

    2014-07-01

    After two years of research and development under ESO support, LAM and Thales SESO present the results of their experiment for the fast and accurate polishing under stress of ELT 1.5 meter segments as well as the industrialization approach for mass production. Based on stress polishing, this manufacturing method requires the conception of a warping harness able to generate extremely accurate bending of the optical surface of the segments during the polishing. The conception of the warping harness is based on finite element analysis and allowed a fine tuning of each geometrical parameter of the system in order to fit an error budget of 25nm RMS over 300μm of bending peak to valley. The optimisation approach uses the simulated influence functions to extract the system eigenmodes and characterise the performance. The same approach is used for the full characterisation of the system itself. The warping harness has been manufactured, integrated and assembled with the Zerodur 1.5 meter segment on the LAM 2.5meter POLARIS polishing facility. The experiment consists in a cross check of optical and mechanical measurements of the mirrors bending in order to develop a blind process, ie to bypass the optical measurement during the final industrial process. This article describes the optical and mechanical measurements, the influence functions and eigenmodes of the system and the full performance characterisation of the warping harness.

  11. Evaluation of Aromatic Oxidation Reactions in Seven Chemical Mechanisms with an Outdoor Chamber

    Science.gov (United States)

    Simulations using seven chemical mechanisms are intercompared against O3, NOx and hydrocarbon data from photooxidation experiments conducted at the University of North Carolina outdoor smog chamber. The mechanisms include CB4–2002, CB05, CB05-TU, a CB05 vari...

  12. ZERODUR for stress mirror polishing

    Science.gov (United States)

    Jedamzik, Ralf; Kunisch, Clemens; Westerhoff, Thomas

    2011-09-01

    Stress mirror polishing is considered as one of several polishing technologies for the generation of the aspherical shaped primary mirror segments of the thirty meter telescope (TMT). For stress mirror polishing it is essential to precisely know the elastic response of glass ceramic substrate materials under a given deformation load. In the past it was experimentally shown that glass ceramics do not respond instantaneously to loading and unloading conditions, this effect was called "delayed elasticity." Recently SCHOTT has shown that it is possible to use a model to predict the characteristic thermal expansion behaviour of individual ZERODUR® batches for a given temperature profile. A similar approach will be used to predict the delayed elastic behavior of ZERODUR® under time dependent loads. In this presentation the delayed elasticity effect of ZERODUR® is reviewed. The delayed elastic response of the material to load conditions is shown and discussed. First results of a model approach based on experimental results and tools that have been built up for the modelling of the delayed elasticity effect of ZERODUR® will be presented.

  13. Report of National Cancer Institute symposium: comparison of mechanisms of carcinogenesis by radiation and chemical agents. I. Common molecular mechanisms

    Energy Technology Data Exchange (ETDEWEB)

    Borg, D.C.

    1984-01-01

    Some aspects of molecular mechanisms common to radiation and chemical carcinogenesis are discussed, particularly the DNA damage done by these agents. Emphasis is placed on epidemiological considerations and on dose-response models used in risk assessment to extrapolate from experimental data obtained at high doses to the effects from long-term, low-level exposures. 3 references, 6 figures. (ACR)

  14. An Overview of Polish Martial Arts

    Directory of Open Access Journals (Sweden)

    Wojciech J. Cynarski

    2012-07-01

    Full Text Available The purpose of this study is to explain the revival of Polish martial arts from the perspectives of cultural sociology, the sciences of physical culture, and the humanistic theory of martial arts. The Polish Martial Arts (Polskie Sztuki Walki are a subject still requiring serious scientific examination, even in Poland. There are few works concerning the history of Polish weapons, and most only describe techniques for wielding specific types of edged weapons. Nevertheless, there is a large group of enthusiasts trying to restore and cultivate the old Polish tradition, a tradition with heavy emphasis on the art of fencing. The author knows many of the people and facts presented here, from personal observation and from direct participation in these arts. As a disciple of the late Master Yoshio Sugino (10th-dan Kobudo Katori Shinto-ryu, he fought against the Polish saber champion, and he has taken part in joint exhibitions of Polish and Japanese fencing.

  15. Cleansing orthodontic brackets with air-powder polishing: effects on frictional force and degree of debris

    Science.gov (United States)

    Leite, Brisa dos Santos; Fagundes, Nathalia Carolina Fernandes; Aragón, Mônica Lídia Castro; Dias, Carmen Gilda Barroso Tavares; Normando, David

    2016-01-01

    ABSTRACT Introduction: Debris buildup on the bracket-wire interface can influence friction. Cleansing brackets with air-powder polishing can affect this process. Objective: The aim of this study was to evaluate the frictional force and amount of debris remaining on orthodontic brackets subjected to prophylaxis with air-powder polishing. Methods: Frictional force and debris buildup on the surface of 28 premolar brackets were evaluated after orthodontic treatment. In one hemiarch, each bracket was subjected to air-powder polishing (n = 14) for five seconds, while the contralateral hemiarch (n = 14) served as control. Mechanical friction tests were performed and images of the polished bracket surfaces and control surfaces were examined. Wilcoxon test was applied for comparative analysis between hemiarches at p < 0.05. Results: Brackets that had been cleaned with air-powder polishing showed lower friction (median = 1.27 N) when compared to the control surfaces (median = 4.52 N) (p < 0.01). Image analysis showed that the control group exhibited greater debris buildup (median = 2.0) compared with the group that received prophylaxis with air-powder polishing (median = 0.5) (p < 0.05). Conclusion: Cleansing orthodontic brackets with air-powder polishing significantly reduces debris buildup on the bracket surface while decreasing friction levels observed during sliding mechanics. PMID:27653265

  16. Coal prep in Brazil: the Polish approach

    Energy Technology Data Exchange (ETDEWEB)

    Zilli, C.B.

    1988-02-01

    With one exception, all coal mined in Brazil is washed at the pit head because of its high dirt content. Since the early 1970s five complete coal preparation plants have been designed and constructed by a consortium, using Polish technology. Among the changes effected by the Polish engineers was the introduction of Polish designed equipment. These have led to several small modifications on the usual flowsheet design, which have increased recoveries. 4 figs.

  17. Material Characterization in the Electro-Analytic Approach for Applications in Chemical Mechanical Planarization and Electrochemical Energy Systems

    Science.gov (United States)

    Rock, Simon E.

    the generation of ion-incorporated tantalum pentoxide. DBSA strongly affects the CMP chemistry of Cu, but exhibits relatively weaker effects on the surface activity of Ta, and thus plays a vital role in dictating the selectivity of Ta:Cu polish rates. CMP of tantalum nitride is also an essential step of material processing in the fabrication of integrated circuits, which is looked separately in this thesis. The present work investigates certain chemical aspects of this strategy of TaN-CMP by also using guanidine carbonate (GC) as a surface complexing agent, and employing electrochemical experiments. The experiments are designed to study the chemical and electrochemical origins of the CMP-specific surface complex films formed on a TaN wafer in acidic solutions of GC and hydrogen peroxide. Open circuit potential, polarization resistance, and electrochemical impedance measurements are employed to probe the surface effects that facilitate material removal in chemically prevailing CMP of TaN. The results are discussed in view of designing slurry variables to support barrier layer planarization with reduced roles of mechanical abrasion. Nonvolatile and nonflammable ionic liquids (ILs) have distinct thermal advantages over the traditional organic solvent electrolytes of lithium ion batteries. However, this beneficial feature of ILs is often counterbalanced by their high viscosity (a limiting factor for ionic conductivity) and, sometimes, by their unsuitable electrochemistry for generating protective layers on electrode surfaces. In an effort to alleviate these limiting Aspects of ILs, we have synthesized a PEGylated imidazolium bis(triflouromethylsulfonyl)amide (bistriflamide) IL that exhibited better thermal and electrochemical stability than a conventional electrolyte based on a blend of ethylene carbonate and diethyl carbonate. The electrochemical performance of this IL has been demonstrated using a cathode consisting of ball-milled LiMn2O4 particles. A direct comparison

  18. Polish-Chinese Economic Relations after Polish Accession to European Union

    OpenAIRE

    Kalinowska, Izabela

    2011-01-01

    The aim of the article is to analize polish-chinese economic relations after polish accession to the European Union structures. Studies carried out in the first part of the article concern trade rates between the two countries. Results show that polish import from China exceed export. The negative trends persist for many years and are continually deepening. From the geographical side, polish import from China flows mainly from the east coast part of China including Peking an...

  19. Diversity of Chemical Mechanisms in Thioredoxin Catalysis Revealed by Single-Molecule Force Spectroscopy

    OpenAIRE

    2009-01-01

    Thioredoxins (Trxs) are oxidoreductase enzymes, present in all organisms, that catalyze the reduction of disulfide bonds in proteins. By applying a calibrated force to a substrate disulfide, the chemical mechanisms of Trx catalysis can be examined in detail at the single-molecule level. Here we use single-molecule force-clamp spectroscopy to explore the chemical evolution of Trx catalysis by probing the chemistry of eight different Trx enzymes. All Trxs show a characteristic Michaelis-Menten ...

  20. Polish in the light of grammaticalization theory

    Directory of Open Access Journals (Sweden)

    Björn Hansen

    2015-11-01

    Full Text Available Polish in the light of grammaticalization theory The paper is concerned with grammaticalization, a type of language change whereby lexical items, in specifi contexts, come to serve grammatical functions, and grammatical items acquire new grammatical functions. The aim is twofold: to shed light at the main properties of grammaticalization, and to demonstrate its applicability to Polish data. Some prominent examples in Polish are discussed: the grammaticalization of modals, imperative and avertive constructions. The paper closes with a non-exhaustive list of leads for further research into grammaticalization in Polish.

  1. Assessment of existing H2/O2 chemical reaction mechanisms at reheat gas turbine conditions

    CERN Document Server

    Weydahl, Torleif; Seljeskog, Morten; Haugen, Nils Erland L

    2011-01-01

    This paper provides detailed comparisons of chemical reaction mechanisms of H2 applicable at high preheat temperatures and pressures relevant to gas turbine and particularly Alstom's reheat gas turbine conditions. It is shown that the available reaction mechanisms exhibit large differences in several important elementary reaction coefficients. The reaction mechanisms are assessed by comparing ignition delay and laminar flame speed results obtained from CHEMKIN with available data, however, the amount of data at these conditions is scarce and a recommended candidate among the mechanisms can presently not be selected. Generally, the results with the GRI-Mech and Leeds mechanisms deviate from the Davis, Li, O'Conaire, Konnov and San Diego mechanisms, but there are also significant deviations between the latter five mechanisms that altogether are better adapted to hydrogen. The differences in ignition delay times between the dedicated hydrogen mechanisms (O'Conaire, Li and Konnov) range from approximately a maxim...

  2. Organic chemical aging mechanisms: An annotated bibliography. Waste Tank Safety Program

    Energy Technology Data Exchange (ETDEWEB)

    Samuels, W.D.; Camaioni, D.M.; Nelson, D.A.

    1993-09-01

    An annotated bibliography has been compiled of the potential chemical and radiological aging mechanisms of the organic constituents (non-ferrocyanide) that would likely be found in the UST at Hanford. The majority of the work that has been conducted on the aging of organic chemicals used for extraction and processing of nuclear materials has been in conjunction with the acid or PUREX type processes. At Hanford the waste being stored in the UST has been stabilized with caustic. The aging factors that were used in this work were radiolysis, hydrolysis and nitrite/nitrate oxidation. The purpose of this work was two-fold: to determine whether or not research had been or is currently being conducted on the species associated with the Hanford UST waste, either as a mixture or as individual chemicals or chemical functionalities, and to determine what areas of chemical aging need to be addressed by further research.

  3. Protein structure validation and refinement using amide proton chemical shifts derived from quantum mechanics

    DEFF Research Database (Denmark)

    Christensen, Anders Steen; Linnet, Troels Emtekær; Borg, Mikael;

    2013-01-01

    We present the ProCS method for the rapid and accurate prediction of protein backbone amide proton chemical shifts - sensitive probes of the geometry of key hydrogen bonds that determine protein structure. ProCS is parameterized against quantum mechanical (QM) calculations and reproduces high level...... QM results obtained for a small protein with an RMSD of 0.25 ppm (r = 0.94). ProCS is interfaced with the PHAISTOS protein simulation program and is used to infer statistical protein ensembles that reflect experimentally measured amide proton chemical shift values. Such chemical shift...

  4. Perceptions of and Attitudes towards Regional Varieties of Polish: Views from Two Polish Provinces

    Science.gov (United States)

    Milobog, Magdalena; Garrett, Peter

    2011-01-01

    This paper reports a study of perceptions and attitudes relating to regional varieties of Polish. The methodology followed folk linguistic approaches to attitudes research. Respondents in two Polish provinces were asked to draw on a map of Poland where they thought the main regional varieties of Polish were spoken, and then to name and…

  5. Lexical Server of Polish Language

    Directory of Open Access Journals (Sweden)

    Marek Gajecki

    2001-01-01

    Full Text Available This paper presents Lexical Server of Polish Language, the tool that aids natural language processing (NLP. Database of the server consists of dictionary units enriched by lexical information. The lexical server should be able to perform identification of word forms and generations of all inflected forms of the word. The server is dedicated to the people who are looking for NLP algorithms or implement them. The algorithms can be implemented in different kinds of programming languages and different operating systems. There are some examples of problems when lexical server can be useful: automatic text correction, tcxt indexing, keywords extraction, text profile building.

  6. SELECTED FEATURES OF POLISH FARMERS

    Directory of Open Access Journals (Sweden)

    Grzegorz Spychalski

    2013-12-01

    Full Text Available The paper presents results of the research carried out among farm owners in Wielkopolskie voivodeship referring to selected features of social capital. The author identifies and estimates impact of some socio-professional factors on social capital quality and derives statistical conclusion. As a result there is a list of economic policy measures facilitating rural areas development in this aspect. The level of education, civic activity and tendency for collective activity are main conditions of social capital quality in Polish rural areas.

  7. Polish Foundation for Energy Efficiency

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    1995-12-31

    The Polish Foundation for Energy Efficiency (FEWE) was established in Poland at the end of 1990. FEWE, as an independent and non-profit organization, has the following objectives: to strive towards an energy efficient national economy, and to show the way and methods by use of which energy efficiency can be increased. The activity of the Foundation covers the entire territory of Poland through three regional centers: in Warsaw, Katowice and Cracow. FEWE employs well-known and experienced specialists within thermal and power engineering, civil engineering, economy and applied sciences. The organizer of the Foundation has been Battelle Memorial Institute - Pacific Northwest Laboratories from the USA.

  8. The Radical Pair Mechanism and the Avian Chemical Compass: Quantum Coherence and Entanglement

    CERN Document Server

    Zhang, Yiteng; Kais, Sabre

    2015-01-01

    We review the spin radical pair mechanism which is a promising explanation of avian navigation. This mechanism is based on the dependence of product yields on (1) the hyperfine interaction involving electron spins and neighboring nuclear spins and (2) the intensity and orientation of the geomagnetic field. One surprising result is that even at ambient conditions quantum entanglement of electron spins can play an important role in avian magnetoreception. This review describes the general scheme of chemical reactions involving radical pairs generated from singlet and triplet precursors; the spin dynamics of the radical pairs; and the magnetic field dependence of product yields caused by the radical pair mechanism. The main part of the review includes a description of the chemical compass in birds. We review: the general properties of the avian compass; the basic scheme of the radical pair mechanism; the reaction kinetics in cryptochrome; quantum coherence and entanglement in the avian compass; and the effects o...

  9. The occurrence of defects of potato tubers in conditions of mechanical-chemical weeding

    Directory of Open Access Journals (Sweden)

    Krystyna Zarzecka

    2013-03-01

    Full Text Available The presented results were obtained from field experiment conducted in the period 2005-2007. Experimental variants included four weed control methods: one mechanical (control object and three combinations of mechanical and chemical treatments with the use of herbicides Plateen 41,5 WG, Racer 250 EC and Sencor 70 WG. Mechanical-chemical treatments contributed to the decrease of external and internal defects as compared to the control object with mechanical weeding. Significant effects of the weed control methods and weather conditions on the side yields (mass of small tubers and mass of tubers with defects were observed in the years of study. Results show that share of side yield in total yield amounted to mean 31.1%.

  10. Mechanical Erosion in a Tropical River Basin in Southeastern Brazil: Chemical Characteristics and Annual Fluvial Transport Mechanisms

    Directory of Open Access Journals (Sweden)

    Alexandre Martins Fernandes

    2012-01-01

    Full Text Available This study aims to evaluate the mechanical erosion processes that occur in a tropical river basin, located in the São Paulo state, southeastern Brazil, through the chemical characterization of fine suspended sediments and the transport mechanisms near the river mouth, from March 2009 to September 2010. The chemical characterization indicated the predominance of SiO2, Al2O3, and Fe2O3 and showed no significant seasonal influences on the major element concentrations, expressed as oxides. The concentration variations observed were related to the mobility of chemical species. The evaluation of the rock-alteration degree indicated that the physical weathering was intense in the drainage basin. The fine suspended sediments charge was influenced by the variation discharges throughout the study period. The solid charge estimate of the surface runoff discharge was four times higher in the rainy season than the dry season. The transport of fine suspended sediments at the Sorocaba River mouth was 55.70 t km−2 a−1, corresponding to a specific physical degradation of 37.88 m Ma−1, a value associated with the mechanical erosion rate that corresponds to the soil thickness reduction in the drainage basin.

  11. Evaluation of action mechanisms of toxic chemicals using JFCR39, a panel of human cancer cell lines.

    Science.gov (United States)

    Nakatsu, Noriyuki; Nakamura, Tomoki; Yamazaki, Kanami; Sadahiro, Soutaro; Makuuchi, Hiroyasu; Kanno, Jun; Yamori, Takao

    2007-11-01

    We previously established a panel of human cancer cell lines, JFCR39, coupled to an anticancer drug activity database; this panel is comparable with the NCI60 panel developed by the National Cancer Institute. The JFCR39 system can be used to predict the molecular targets or evaluate the action mechanisms of the test compounds by comparing their cell growth inhibition profiles (i.e., fingerprints) with those of the standard anticancer drugs using the COMPARE program. In this study, we used this drug activity database-coupled JFCR39 system to evaluate the action mechanisms of various chemical compounds, including toxic chemicals, agricultural chemicals, drugs, and synthetic intermediates. Fingerprints of 130 chemicals were determined and stored in the database. Sixty-nine of 130 chemicals ( approximately 60%) satisfied our criteria for the further analysis and were classified by cluster analysis of the fingerprints of these chemicals and several standard anticancer drugs into the following three clusters: 1) anticancer drugs, 2) chemicals that shared similar action mechanisms (for example, ouabain and digoxin), and 3) chemicals whose action mechanisms were unknown. These results suggested that chemicals belonging to a cluster (i.e., a cluster of toxic chemicals, a cluster of anticancer drugs, etc.) shared similar action mechanism. In summary, the JFCR39 system can classify chemicals based on their fingerprints, even when their action mechanisms are unknown, and it is highly probable that the chemicals within a cluster share common action mechanisms.

  12. TOXICOGENOMIC STUDY OF TRIAZOLE FUNGICIDES AND PERFLUOROALKYL ACIDS IN RAT LIVERS ACCURATELY CATEGORIZES CHEMICALS AND IDENTIFIES MECHANISMS OF TOXICITY

    Science.gov (United States)

    Toxicogenomic analysis of five environmental chemicals was performed to investigate the ability of genomics to predict toxicity, categorize chemicals, and elucidate mechanisms of toxicity. Three triazole antifungals (myclobutanil, propiconazole, and triadimefon) and two perfluori...

  13. The Influence of Surface Polish and Beverages on the Roughness of Nanohybrid and Microhybri Resin Composites

    Directory of Open Access Journals (Sweden)

    Sadeghi M

    2016-03-01

    Full Text Available Statement of the Problem: Surface roughness is a key factor in the aesthetics of restorative dentistry as it can determine the clinical quality and success of restorative materials. The chemical process of dissolution in the presence of mechanical forces can accelerate the surface roughness of tooth-coloured restorative materials. Objectives: To determine the degree of surface roughness of a microhybrid and a nanohybrid resin composite after polishing and immersion in various solutions. Materials and Methods: Two resin composites were used : a microhybrid (Gradia direct, GC, and a nanohybrid (Ice, SDI. A total of 54 disc-shaped specimens were prepared for each composite and immersed in distilled water incubated at 37 °C for 24 hours. After 24 h, the baseline measurement for surface roughness (Ra was performed and the specimens were divided into 3 groups of 18 and tested with unpolished or after polishing with Sof-Lex disc and Enhance point systems. Specimens in each group were subdivided into 3 subgroups (n = 6 and immersed in 3 solutions (distilled water, coffee, and cola for 7 days incubated at 37 °C. After 7 days, the specimens were rinsed with tap water for 10 seconds, dried with paper towel and Ra was measured again. Two randomly selected specimens of each group were sputter coated with gold and examined using a Field-Emission Scanning Electron Microscope (SEM. Results: Gradia direct showed a greater Ra than ice in all solutions for all polishing systems (p < 0.001. Specimens polished with Enhance point revealed a significantly greater roughness than Sof-Lex discs and both showed greater Ra than unpolished specimens. Specimens immersed in coffee exhibited significantly greater surface roughness than that of distilled water (p < 0.05 and cola (p < 0.001. Conclusions: Nano-hybrid composite showed a significantly smoother surface than microhybrid. Coffee exhibited the highest Ra compared to distilled water and cola. Enhance point revealed

  14. The Bulgarian-Polish-Russian parallel corpus

    Directory of Open Access Journals (Sweden)

    Maksim Duškin

    2015-11-01

    Full Text Available The Bulgarian-Polish-Russian parallel corpus The Semantics Laboratory Team of Institute of Slavic Studies of Polish Academy of Sciences is planning to begin work on the creation of a Bulgarian-Polish-Russian parallel corpus. The three selected languages are representatives of the main groups of Slavic languages: Bulgarian represents the southern group of Slavic languages, Polish – the western group of Slavic languages, Russian – the eastern group of Slavic languages. Our project will be the first parallel corpus of these three languages. The planned corpus will be based on material, dating from one period (the 20th century and will have a synchronous nature. The project will not constitute the sum of the separate corpora of selected languages. One of the problems with creating multilingual parallel corpora are different proportions of translated texts between the selected languages, for example, Polish literature is often translated into Bulgarian, but not vice versa. Bulgarian, Russian and Polish differ typologically – Bulgarian is an analytic language, Polish and Russian are synthetic. The parallel corpus should have compatible annotation, while taking into account the characteristic features of the selected languages. We hope that the Bulgarian-Polish-Russian parallel corpus will serve as a source of linguistic material of contrastive language studies and may prove to be a big help for linguists, translators, terminologists and students of linguistics. The results of our work will be available on the Internet.

  15. Effect of the geometry of workpiece on polishing velocity in free annular polishing

    Institute of Scientific and Technical Information of China (English)

    Quantang Fan; Jianqiang Zhu; Bao'an Zhang

    2007-01-01

    Base on Coulomb friction model, the workpieces with different geometry rotating in free annular polishing are simulated. From simulation, the following conclusions are drawn. The angular velocity of workpiece is higher than that of polishing pad if the ring rotates uncontrolled in free annular polishing. The circular workpiece can synchronize with polishing pad through controlling the rotation of ring, which depends on the radii of ring and workpiece, the friction coefficients of polishing pad-workpiece and ring-workpiece,and the angular velocity of polishing pad. The workpiece with sharp corner cannot contact with the ring contiguously, which causes the contact state changing and the angular velocity of workpiece fluctuating ceaselessly, and this type of workpiece should be controlled with clamp to rotate synchronistically with the polishing pad.

  16. Chemical and Mechanical Alteration of Fractures: Micro-Scale Simulations and Comparison to Experimental Results

    Science.gov (United States)

    Ameli, P.; Detwiler, R. L.; Elkhoury, J. E.; Morris, J. P.

    2012-12-01

    Fractures are often the main pathways for subsurface fluid flow especially in rocks with low matrix porosity. Therefore, the hydro-mechanical properties of fractures are of fundamental concern for subsurface CO2 sequestration, enhanced geothermal energy production, enhanced oil recovery, and nuclear waste disposal. Chemical and mechanical stresses induced during these applications may lead to significant alteration of the hydro-mechanical properties of fractures. Laboratory experiments aimed at understanding the chemo-hydro-mechanical response of fractures have shown a range of results that contradict simple conceptual models. For example, under conditions favoring mineral dissolution, where one would expect an overall increase in permeability and fracture aperture, permeability increases under some conditions and decreases under others. Recent experiments have attempted to link these core-scale observations to the relevant small-scale processes occurring within fractures. Results suggest that the loss of mechanical strength in asperities due to chemical alteration may cause non-uniform deformation and alteration of fracture apertures. However, it remains difficult to directly measure the coupled chemical and mechanical processes that lead to alteration of contacting fracture surfaces, which challenges our ability to predict the long-term evolution of the hydro-mechanical properties of fractures. Here, we present a computational model that uses micro-scale surface roughness and explicitly couples dissolution and elastic deformation to calculate local alterations in fracture aperture under chemical and mechanical stresses. Chemical alteration of the fracture surfaces is modeled using a depth-averaged algorithm of fracture flow and reactive transport. Then, we deform the resulting altered fracture-surfaces using an algorithm that calculates the elastic deformation. Nonuniform dissolution may cause the location of the resultant force between the two contacting

  17. Diversity of Chemical Mechanisms in Thioredoxin Catalysis Revealed by Single-Molecule Force Spectroscopy

    Science.gov (United States)

    Perez-Jimenez, Raul; Li, Jingyuan; Kosuri, Pallav; Sanchez-Romero, Inmaculada; Wiita, Arun P.; Rodriguez-Larrea, David; Chueca, Ana; Holmgren, Arne; Miranda-Vizuete, Antonio; Becker, Katja; Cho, Seung-Hyun; Beckwith, Jon; Gelhaye, Eric; Jacquot, Jean P.; Gaucher, Eric; Sanchez-Ruiz, Jose M.; Berne, Bruce J.; Fernandez, Julio M.

    2009-01-01

    Thioredoxins are oxido-reductase enzymes present in all organisms, catalyzing the reduction of disulfide bonds in proteins. By applying a calibrated force to a substrate disulfide, the chemical mechanisms of Trx catalysis can be examined in detail at the single molecule level. Here we use single molecule force-clamp spectroscopy to explore the chemical evolution of Trx catalysis by probing the chemistry of eight different thioredoxin enzymes. While all Trxs show a characteristic Michaelis-Menten mechanism detected when the disulfide bond is stretched at low forces, two different chemical behaviors distinguish bacterial from eukaryotic-origin Trxs at high forces. Eukaryotic-origin Trxs reduce disulfide bonds through a single-electron transfer reaction (SET) whereas bacterial-origin Trxs exhibit both nucleophilic substitution (SN2) and SET reactions. A computational analysis of Trx structures identifies the evolution of the binding groove as an important factor controlling the chemistry of Trx catalysis. PMID:19597482

  18. Establishment of the carbon label mechanism of coal chemical products based oncarbon footprint

    Directory of Open Access Journals (Sweden)

    Wu Bishan

    Full Text Available ABSTRACT After redefining the carbon footprint and carbon label, the paper analyzesthe significance of the carbon labels under the background of the low carbon economy development, and establishes the concept of model of the carbon labels mechanism to chemical products. At the same time, the paper quantitatively studies carbon label data sourceof three kinds of coal chemical industry power products, which are fromhaving not CCS technologies of supercritical boiler of coal, using CCS technologies of supercritical boiler of coal and adopting CCS and IGCC technologies to power generation in CCI. Based on the three kinds of differences, the paper puts forward of establishing the carbon labels mechanism of chemical products under the low carbon consumption.

  19. Chemical Fume Hoods in Higher Education Science Laboratories: Electrical, Mechanical and Human Controls.

    Science.gov (United States)

    Casey, John M.

    This paper is predicated on the realization that a chemical hood is only one element of laboratory safety which encompasses a variety of other elements starting with the architectural design and layout of laboratories; through the installation, operation and maintenance of integrated electrical and mechanical systems; to the safety-mindedness of…

  20. Evaluation and Development of Chemical Kinetic Mechanism Reduction Scheme for Biodiesel and Diesel Fuel Surrogates

    DEFF Research Database (Denmark)

    Poon, Hiew Mun; Ng, Hoon Kiat; Gan, Suyin

    2013-01-01

    The aim of this study is to evaluate the existing chemical kinetic mechanism reduction techniques. From here, an appropriate reduction scheme was developed to create compact yet comprehensive surrogate models for both diesel and biodiesel fuels for diesel engine applications. The reduction techni...

  1. Mechanical properties and chemical stability of pivalolactone-based poly(ether ester)s

    NARCIS (Netherlands)

    Tijsma, E.J.; Does, van der L.; Bantjes, A.; Vulic, I.

    1994-01-01

    The processing, mechanical and chemical properties of poly(ether ester)s, prepared from pivalolactone (PVL), 1,4-butanediol (4G) and dimethyl terephthalate (DMT), were studied. The poly(ether ester)s could easily be processed by injection moulding, owing to their favourable rheological and thermal p

  2. The mechanical properties of thin alumina film deposited by metal-organic chemical vapour deposition

    NARCIS (Netherlands)

    Haanappel, V.A.C.; Gellings, P.J.; Vendel, van de D.; Metselaar, H.S.C.; Corbach, van H.D.; Fransen, T.

    1995-01-01

    Amorphous alumina films were deposited by metal-organic chemical vapour deposition (MOCVD) on stainless steel, type AISI 304. The MOCVD experiments were performed in nitrogen at low and atmospheric pressures. The effects of deposition temperature, growth rate and film thickness on the mechanical pro

  3. Mechanism for the Environmental Process & Ecological Effects of Typical Chemical Pollutants

    Institute of Scientific and Technical Information of China (English)

    XU Xiaobai; WANG Liansheng; DAI Shugui; HUANG Yuyao

    2007-01-01

    @@ Principally being engaged in the field of earth sciences, this research project explores the mechanism which governs the environmental process of some typical chemical contaminants and their eco-toxic effects at various levels. The research project features the following achievements:

  4. Protein structure validation and refinement using amide proton chemical shifts derived from quantum mechanics

    DEFF Research Database (Denmark)

    Christensen, Anders Steen; Linnet, Troels Emtekær; Borg, Mikael;

    2013-01-01

    We present the ProCS method for the rapid and accurate prediction of protein backbone amide proton chemical shifts - sensitive probes of the geometry of key hydrogen bonds that determine protein structure. ProCS is parameterized against quantum mechanical (QM) calculations and reproduces high level...

  5. Structure-mechanism-based engineering of chemical regulators targeting distinct pathological factors in Alzheimer's disease

    Science.gov (United States)

    Beck, Michael W.; Derrick, Jeffrey S.; Kerr, Richard A.; Oh, Shin Bi; Cho, Woo Jong; Lee, Shin Jung C.; Ji, Yonghwan; Han, Jiyeon; Tehrani, Zahra Aliakbar; Suh, Nayoung; Kim, Sujeong; Larsen, Scott D.; Kim, Kwang S.; Lee, Joo-Yong; Ruotolo, Brandon T.; Lim, Mi Hee

    2016-10-01

    The absence of effective therapeutics against Alzheimer's disease (AD) is a result of the limited understanding of its multifaceted aetiology. Because of the lack of chemical tools to identify pathological factors, investigations into AD pathogenesis have also been insubstantial. Here we report chemical regulators that demonstrate distinct specificity towards targets linked to AD pathology, including metals, amyloid-β (Aβ), metal-Aβ, reactive oxygen species, and free organic radicals. We obtained these chemical regulators through a rational structure-mechanism-based design strategy. We performed structural variations of small molecules for fine-tuning their electronic properties, such as ionization potentials and mechanistic pathways for reactivity towards different targets. We established in vitro and/or in vivo efficacies of the regulators for modulating their targets' reactivities, ameliorating toxicity, reducing amyloid pathology, and improving cognitive deficits. Our chemical tools show promise for deciphering AD pathogenesis and discovering effective drugs.

  6. Structure-mechanism-based engineering of chemical regulators targeting distinct pathological factors in Alzheimer's disease.

    Science.gov (United States)

    Beck, Michael W; Derrick, Jeffrey S; Kerr, Richard A; Oh, Shin Bi; Cho, Woo Jong; Lee, Shin Jung C; Ji, Yonghwan; Han, Jiyeon; Tehrani, Zahra Aliakbar; Suh, Nayoung; Kim, Sujeong; Larsen, Scott D; Kim, Kwang S; Lee, Joo-Yong; Ruotolo, Brandon T; Lim, Mi Hee

    2016-10-13

    The absence of effective therapeutics against Alzheimer's disease (AD) is a result of the limited understanding of its multifaceted aetiology. Because of the lack of chemical tools to identify pathological factors, investigations into AD pathogenesis have also been insubstantial. Here we report chemical regulators that demonstrate distinct specificity towards targets linked to AD pathology, including metals, amyloid-β (Aβ), metal-Aβ, reactive oxygen species, and free organic radicals. We obtained these chemical regulators through a rational structure-mechanism-based design strategy. We performed structural variations of small molecules for fine-tuning their electronic properties, such as ionization potentials and mechanistic pathways for reactivity towards different targets. We established in vitro and/or in vivo efficacies of the regulators for modulating their targets' reactivities, ameliorating toxicity, reducing amyloid pathology, and improving cognitive deficits. Our chemical tools show promise for deciphering AD pathogenesis and discovering effective drugs.

  7. Polish Industry and Art at CERN

    CERN Multimedia

    2000-01-01

    On 17 October 2000 the second Polish industrial and technological exhibition opened at CERN. The first one was held five years ago and nine of the companies that were present then have come back again this year. Six of those companies were awarded contracts with CERN in 1995. Three Polish officials were present at the Opening Ceremony today: Mrs Malgorzata Kozlowska, Under-secretary of State in the State Committee for Scientific Research, Mr Henryk Ogryczak, Under-secretary of State in Ministry of Economy and Prof. Jerzy Niewodniczanski, President of National Atomic Energy Agency. Professor Luciano Maiani welcomed the Polish delegation to CERN and stressed the important contribution of Polish scientists and industrialists to the work of the laboratory. Director General Luciano Maiani (back left) and head of SPL division Karl-Heinz Kissler (back right) visit the Poland at CERN exhibition… The exhibition offers Polish companies the opportunity to establish professional contacts with CERN. Nineteen companies...

  8. Compressive elastic moduli and polishing performance of non-rigid core/shell structured PS/SiO{sub 2} composite abrasives evaluated by AFM

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Ailian [College of Mechanical and Energy Engineering, Changzhou University, Changzhou, Jiangsu 213016 (China); Mu, Weibin [School of Materials Science and Engineering, Changzhou University, Changzhou, Jiangsu 213164 (China); Chen, Yang, E-mail: cy.jpu@126.com [School of Materials Science and Engineering, Changzhou University, Changzhou, Jiangsu 213164 (China)

    2014-01-30

    The core/shell structured polystyrene (PS)/SiO{sub 2} composite microspheres with different silica shell morphology were synthesized by a modified Stöber method. As confirmed by transmission electron microscopy (TEM), the rough discontinuous shell consisted of separate SiO{sub 2} nanoparticles for composite-A, while the smooth continuous one was composed of amorphous silica network for composite-B. Atomic force microscopy (AFM) was employed to probe the compressive Young's moduli (E) and chemical mechanical polishing (CMP) performances of the as-prepared PS/SiO{sub 2} composite microspheres. On the basis of the Hertzian contact mechanics, the calculated E values of the PS microspheres, composite-A and composite-B were 2.9 ± 0.4, 5.1 ± 1.2 and 6.0 ± 1.2 GPa, respectively. Compared to traditional abrasives, thermally grown silicon oxide wafers after polished by the core/shell PS/SiO{sub 2} composite abrasives obtained a lower root mean square roughness and a higher material removal rate value. In addition, there is an obvious effect of shell morphology of the composites on oxide CMP performance and structural stability during polishing process. This approach would provide a basis for understanding the actual role of organic/inorganic core/shell composite abrasives in the material removal process of CMP.

  9. Intercomparison of chemical mechanisms for air quality policy formulation and assessment under North American conditions.

    Science.gov (United States)

    Derwent, Richard

    2017-02-22

    The intercomparison of seven chemical mechanisms for their suitability for air quality policy formulation and assessment is described. Box modelling techniques were employed using 44 sets of background environmental conditions covering North America to constrain the chemical development of the longer-lived species. The selected mechanisms were modified to enable an unbiased assessment of the adequacy of the parameterisations of photochemical ozone production from VOC oxidation in the presence of NOx. Photochemical ozone production rates responded differently to 30% NOx and VOC reductions with the different mechanisms, despite the striking similarities between the base case ozone production rates. The 30% reductions in NOx and VOCs also produced changes in OH. The responses in OH to 30% reductions in NOx and VOCs appeared to be more sensitive to mechanism choice, compared with the responses in the photochemical ozone production rates. Whereas 30% NOx reductions generally led to decreases in OH, 30% reductions in VOCs led to increases in OH, irrespective of mechanism choice and background environmental conditions. The different mechanisms therefore gave different OH responses to NOx and VOC reductions and so would give different responses in terms of changes in the fate and behaviour of air toxics, acidification and eutrophication and fine particle formation compared with others, in response to ozone control strategies. Policy-makers need to understand that there are likely to be inherent differences in the responses to ozone control strategies between different mechanisms, depending on background environmental conditions and the extents of NOx and VOC reductions under consideration. IMPLICATIONS The purpose of this paper is to compare predicted ozone responses to NOx and VOC reductions with seven chemical mechanisms under North American conditions. The good agreement found between the tested mechanisms should provide some support for their application in the air

  10. Direct imaging of mechanical and chemical gradients across the thickness of graded organosilicone microwave PECVD coatings.

    Science.gov (United States)

    Hall, Colin J; Murphy, Peter J; Griesser, Hans J

    2014-01-22

    The characterization of variations in the chemical composition and ensuing mechanical properties across the thickness of coatings with continuously varying compositions through their thickness (graded coatings) presents considerable challenges for current analytical techniques in materials science. We report here the direct imaging of nanomechanical and chemical gradients across cross-sections of an organosilicone coating fabricated via microwave plasma enhanced chemical vapor deposition (PECVD). Cross-sectional nanoindentation was used to determine the mechanical properties of uniform and graded organosilicone coatings. Both hardness and modulus across the coatings were directly measured. Additionally, "modulus mapping" on cross-sections was used to map the complex modulus. For the graded coating, it was found that variations in the complex modulus was predominantly due to varying storage modulus. It was observed that at the interface with the substrate there was a low storage modulus, which linearly increased to a relatively high storage modulus at the surface. It is proposed that the increase in stiffness, from the substrate interface to the outer surface, is due to the increasing content of a cross-linked O-Si-O network. This mechanical gradient has been linked to a change in the Si:O ratio via direct compositional mapping using ToF-SIMS. Direct mapping of the mechanical and compositional gradients across these protective coatings provides insight into the changes in properties with depth and supports optimization of the critical mechanical performance of PECVD graded coatings.

  11. Chemical reaction of hexagonal boron nitride and graphite nanoclusters in mechanical milling systems

    Energy Technology Data Exchange (ETDEWEB)

    Muramatsu, Y.; Grush, M.; Callcott, T.A. [Univ. of Tennessee, Knoxville, TN (United States)] [and others

    1997-04-01

    Synthesis of boron-carbon-nitride (BCN) hybrid alloys has been attempted extensively by many researchers because the BCN alloys are considered an extremely hard material called {open_quotes}super diamond,{close_quotes} and the industrial application for wear-resistant materials is promising. A mechanical alloying (MA) method of hexagonal boron nitride (h-BN) with graphite has recently been studied to explore the industrial synthesis of the BCN alloys. To develop the MA method for the BCN alloy synthesis, it is necessary to confirm the chemical reaction processes in the mechanical milling systems and to identify the reaction products. Therefore, the authors have attempted to confirm the chemical reaction process of the h-BN and graphite in mechanical milling systems using x-ray absorption near edge structure (XANES) methods.

  12. Correlation between mechanical and chemical degradation after outdoor and accelerated laboratory aging for multilayer photovoltaic backsheets

    Science.gov (United States)

    Lin, Chiao-Chi; Lyu, Yadong; Yu, Li-Chieh; Gu, Xiaohong

    2016-09-01

    Channel cracking fragmentation testing and attenuated total reflectance Fourier transform infrared (ATR-FTIR) spectroscopy were utilized to study mechanical and chemical degradation of a multilayered backsheet after outdoor and accelerated laboratory aging. A model sample of commercial PPE backsheet, namely polyethylene terephthalate/polyethylene terephthalate/ethylene vinyl acetate (PET/PET/EVA) was investigated. Outdoor aging was performed in Gaithersburg, Maryland, USA for up to 510 days, and complementary accelerated laboratory aging was conducted on the NIST (National Institute of Standards and Technology) SPHERE (Simulated Photodegradation via High Energy Radiant Exposure). Fracture energy, mode I stress intensity factor and film strength were analyzed using an analytical model based on channel cracking fragmentation testing results. The correlation between mechanical and chemical degradation was discussed for both outdoor and accelerated laboratory aging. The results of this work provide preliminary understanding on failure mechanism of backsheets after weathering, laying the groundwork for linking outdoor and indoor accelerated laboratory testing for multilayer photovoltaic backsheets.

  13. A coupled mechanical and chemical damage model for concrete affected by alkali–silica reaction

    Energy Technology Data Exchange (ETDEWEB)

    Pignatelli, Rossella, E-mail: rossellapignatelli@gmail.com [Department of Civil and Environmental Engineering, Politecnico di Milano, Piazza L. da Vinci 32, 20133 Milano (Italy); Lombardi Ingegneria S.r.l., Via Giotto 36, 20145 Milano (Italy); Comi, Claudia, E-mail: comi@stru.polimi.it [Department of Civil and Environmental Engineering, Politecnico di Milano, Piazza L. da Vinci 32, 20133 Milano (Italy); Monteiro, Paulo J.M., E-mail: monteiro@ce.berkeley.edu [Department of Civil and Environmental Engineering, University of California, Berkeley, CA 94720 (United States)

    2013-11-15

    To model the complex degradation phenomena occurring in concrete affected by alkali–silica reaction (ASR), we formulate a poro-mechanical model with two isotropic internal variables: the chemical and the mechanical damage. The chemical damage, related to the evolution of the reaction, is caused by the pressure generated by the expanding ASR gel on the solid concrete skeleton. The mechanical damage describes the strength and stiffness degradation induced by the external loads. As suggested by experimental results, degradation due to ASR is considered to be localized around reactive sites. The effect of the degree of saturation and of the temperature on the reaction development is also modeled. The chemical damage evolution is calibrated using the value of the gel pressure estimated by applying the electrical diffuse double-layer theory to experimental values of the surface charge density in ASR gel specimens reported in the literature. The chemo-damage model is first validated by simulating expansion tests on reactive specimens and beams; the coupled chemo-mechanical damage model is then employed to simulate compression and flexure tests results also taken from the literature. -- Highlights: •Concrete degradation due to ASR in variable environmental conditions is modeled. •Two isotropic internal variables – chemical and mechanical damage – are introduced. •The value of the swelling pressure is estimated by the diffuse double layer theory. •A simplified scheme is proposed to relate macro- and microscopic properties. •The chemo-mechanical damage model is validated by simulating tests in literature.

  14. EFFECT OF THERMAL TREATMENT ON THE CHEMICAL COMPOSITION AND MECHANICAL PROPERTIES OF BIRCH AND ASPEN

    Directory of Open Access Journals (Sweden)

    Duygu Kocaefe

    2008-05-01

    Full Text Available The high temperature treatment of wood is one of the alternatives to chemical treatment. During this process, the wood is heated to higher temperatures than those of conventional drying. The wood structure changes due to decomposition of hemicelluloses, ramification of lignin, and crystallization of cellulose. The wood becomes less hygroscopic. These changes improve the dimensional stability of wood, increase its resistance to micro-organisms, darken its color, and modify its hardness. However, wood also might loose some of its elasticity. Consequently, the heat treatment conditions have to be optimized. Therefore, it is important to understand the transformation of the chemical structure of wood caused by the treatment. In this study, the modification of the surface composition of the wood was followed with Fourier transform infrared spectroscopy (FTIR and inverse gas chromatography (IGC under different experimental conditions. The effect of maximum treatment temperatures on the chemical composition of Canadian birch and aspen as well as the correlations between their chemical transformation and different mechanical properties are presented. FTIR analysis results showed that the heat treatment affected the chemical composition of birch more compared to that of aspen. The results of IGC tests illustrated that the surfaces of the aspen and birch became more basic with heat treatment. The mechanical properties were affected by degradation of hemicellulose, ramification of lignin and cellulose crystallization.

  15. Sediment losses from forest management: mechanical vs. chemical site preparation after clearcutting

    Energy Technology Data Exchange (ETDEWEB)

    Beasley, R.S.; Granillo, A.B.; Zillmer, V.

    The comparative effects of mechanical and chemical site preparation water yields and sediment losses following forest clearcutting were evaluated over a 4-yr period in the Athens Plateau area of southwestern Arkansas. After 1 yr of pretreatment measurements, three forested water sheds were clearcut and the residual vegetation and debris were sheared and windrowed but not burned. Three watersheds were clearcut in a similar manner, but received chemical site preparation. Residual trees on two watersheds were injected with 2-4, D amine; the third watershed was aerially sprayed with a mixture of Tordon (active ingredient: picloram (4-amino-3,5,6-trichloropicoline acid)) and Garlon (active ingredient; triclopyr (3,5,6-trichloro-2-pyridinyloxyacetic acid)). Three additional watersheds were left undisturbed for controls. Mean annual sediment losses on the mechanically, site prepared watersheds during the first posttreatment year were significantly higher than those from either the chemically site prepared watersheds or controls. Chemical site preparation did not significantly increase sediment losses. Although 2nd yr losses for the mechanical site preparation and control treatments doubled over 1st-yr levels, no significant treatment effect was detected for either site preparation treatment. Third-year losses decreased below 1st-yr losses for all treatments but not to pretreatment year levels. The relatively sharp declines in sediment losses during the third posttreatment year were attributed to rapid regrowth of natural vegetation on the sites.

  16. Chemical-mechanical stability of the hierarchical structure of shell nacre

    Institute of Scientific and Technical Information of China (English)

    2010-01-01

    The hierarchical structure and mechanical property of shell nacre are experimentally investigated from the new aspects of chemical stability and chemistry-mechanics coupling. Through chemical deproteinization or demineralization methods together with characterization techniques at micro/nano scales,it is found that the nacre of abalone,haliotis discus hannai,contains a hierarchical structure stacked with irregular aragonite platelets and interplatelet organic matrix thin layers. Yet the aragonite platelet itself is a nanocomposite consisting of nanoparticles and intraplatelet organic matrix framework. The mean diameter of the nanoparticles and the distribution of framework are quite different for different platelets. Though the interplatelet and in-traplatelet organic matrix can be both decomposed by sodium hydroxide solution,the chemical stability of individual aragonite platelets is much higher than that of the microstructure stacked with them. Further,macroscopic bending test or nanoindentation experiment is performed on the micro/nanostructure of nacre after sodium hydroxide treatment. It is found that the Young’s modulus of both the stacked microstructure and nanocomposite platelet reduced. The reduction of the microstructure is more remark than that of the platelet. Therefore the chemical-mechanical stability of the nanocomposite platelet itself is much higher than that of the stacked microstructure of nacre.

  17. Evidence from pharmacology and pathophysiology suggests that chemicals with dissimilar mechanisms of action could be of bigger concern in the toxicological risk assessment of chemical mixtures than chemicals with a similar mechanism of action

    DEFF Research Database (Denmark)

    Hadrup, Niels

    2014-01-01

    mechanisms of action, similar modes of action or with common target organs. In the European Union, efforts are currently being made to subgroup chemicals according to this need. However, it remains to be determined whether this is the best strategy to obtain data for risk assessment. In conditions...... such as cancer or HIV, it is generally recognised that pharmacological combination therapy targeting different mechanisms of action is more effective than a strategy where only one mechanism is targeted. Moreover, in diseases such as acute myocardial infarction and congestive heart failure, several organ systems...

  18. Peptide Bond Synthesis by a Mechanism Involving an Enzymatic Reaction and a Subsequent Chemical Reaction.

    Science.gov (United States)

    Abe, Tomoko; Hashimoto, Yoshiteru; Zhuang, Ye; Ge, Yin; Kumano, Takuto; Kobayashi, Michihiko

    2016-01-22

    We recently reported that an amide bond is unexpectedly formed by an acyl-CoA synthetase (which catalyzes the formation of a carbon-sulfur bond) when a suitable acid and l-cysteine are used as substrates. DltA, which is homologous to the adenylation domain of nonribosomal peptide synthetase, belongs to the same superfamily of adenylate-forming enzymes, which includes many kinds of enzymes, including the acyl-CoA synthetases. Here, we demonstrate that DltA synthesizes not only N-(d-alanyl)-l-cysteine (a dipeptide) but also various oligopeptides. We propose that this enzyme catalyzes peptide synthesis by the following unprecedented mechanism: (i) the formation of S-acyl-l-cysteine as an intermediate via its "enzymatic activity" and (ii) subsequent "chemical" S → N acyl transfer in the intermediate, resulting in peptide formation. Step ii is identical to the corresponding reaction in native chemical ligation, a method of chemical peptide synthesis, whereas step i is not. To the best of our knowledge, our discovery of this peptide synthesis mechanism involving an enzymatic reaction and a subsequent chemical reaction is the first such one to be reported. This new process yields peptides without the use of a thioesterified fragment, which is required in native chemical ligation. Together with these findings, the same mechanism-dependent formation of N-acyl compounds by other members of the above-mentioned superfamily demonstrated that all members most likely form peptide/amide compounds by using this novel mechanism. Each member enzyme acts on a specific substrate; thus, not only the corresponding peptides but also new types of amide compounds can be formed.

  19. Audit Committee Practice in the Polish Listed Stock Companies. Present Situation and Development Perspectives

    Directory of Open Access Journals (Sweden)

    Piotr Szczepankowski

    2012-06-01

    Full Text Available The audit committee is one of the parts of corporate governance mechanism, which is understood as the relationship between corporate managers, directors and the providers of equity, people and institutions who save and invest their capital to earn the return. This study presents survey research results of audit committee activity in Polish public stock companies quoted on the Warsaw Stock Exchange (WSE. The purpose of this paper is to present the audit committee practice in Poland after 2009. The paper shows that the audit committee practice is still the most problematic issue of transitional Polish corporate governance rules. The survey has shown that the corporate needs and its implementation, and communication with listed companies leave a lot of room for improvement. The paper is based on the documents prepared in 2010 by PricewaterhouseCoopers, the Polish Association of Listed Companies and the Polish Institute of Directors.

  20. Protein Structure Validation and Refinement Using Chemical Shifts Derived from Quantum Mechanics

    DEFF Research Database (Denmark)

    Bratholm, Lars Andersen

    In this thesis, my work involving dierent aspects of protein structure determination by computer modeling is presented. Determination of several protein's native fold were carried out with Markov chain Monte Carlo simulations in the PHAISTOS protein structure simulation framework, utilizing...... to within 3 A. Furthermore, a fast quantum mechanics based chemical shift predictor was developed together with methodology for using chemical shifts in structure simulations. The developed predictor was used for renement of several protein structures and for reducing the computational cost of quantum...

  1. Convergent polishing: a simple, rapid, full aperture polishing process of high quality optical flats & spheres.

    Science.gov (United States)

    Suratwala, Tayyab; Steele, Rusty; Feit, Michael; Dylla-Spears, Rebecca; Desjardin, Richard; Mason, Dan; Wong, Lana; Geraghty, Paul; Miller, Phil; Shen, Nan

    2014-12-01

    Convergent Polishing is a novel polishing system and method for finishing flat and spherical glass optics in which a workpiece, independent of its initial shape (i.e., surface figure), will converge to final surface figure with excellent surface quality under a fixed, unchanging set of polishing parameters in a single polishing iteration. In contrast, conventional full aperture polishing methods require multiple, often long, iterative cycles involving polishing, metrology and process changes to achieve the desired surface figure. The Convergent Polishing process is based on the concept of workpiece-lap height mismatch resulting in pressure differential that decreases with removal and results in the workpiece converging to the shape of the lap. The successful implementation of the Convergent Polishing process is a result of the combination of a number of technologies to remove all sources of non-uniform spatial material removal (except for workpiece-lap mismatch) for surface figure convergence and to reduce the number of rogue particles in the system for low scratch densities and low roughness. The Convergent Polishing process has been demonstrated for the fabrication of both flats and spheres of various shapes, sizes, and aspect ratios on various glass materials. The practical impact is that high quality optical components can be fabricated more rapidly, more repeatedly, with less metrology, and with less labor, resulting in lower unit costs. In this study, the Convergent Polishing protocol is specifically described for fabricating 26.5 cm square fused silica flats from a fine ground surface to a polished ~λ/2 surface figure after polishing 4 hr per surface on a 81 cm diameter polisher.

  2. Utilizing toxicogenomic data to understand chemical mechanism of action in risk assessment

    Energy Technology Data Exchange (ETDEWEB)

    Wilson, Vickie S., E-mail: wilson.vickie@epa.gov [National Health and Environmental Effects Research Laboratory, Office of Research and Development, U.S. Environmental Protection Agency, Research Triangle Park, NC 27711 (United States); Keshava, Nagalakshmi [National Center for Environmental Assessment, Office of Research and Development, U.S. Environmental Protection Agency, 1200 Pennsylvania Ave., NW, Washington, DC 20460 (United States); Hester, Susan [National Health and Environmental Effects Research Laboratory, Office of Research and Development, U.S. Environmental Protection Agency, Research Triangle Park, NC 27711 (United States); Segal, Deborah; Chiu, Weihsueh [National Center for Environmental Assessment, Office of Research and Development, U.S. Environmental Protection Agency, 1200 Pennsylvania Ave., NW, Washington, DC 20460 (United States); Thompson, Chad M. [ToxStrategies, Inc., 23501 Cinco Ranch Blvd., Suite G265, Katy, TX 77494 (United States); Euling, Susan Y. [National Center for Environmental Assessment, Office of Research and Development, U.S. Environmental Protection Agency, 1200 Pennsylvania Ave., NW, Washington, DC 20460 (United States)

    2013-09-15

    The predominant role of toxicogenomic data in risk assessment, thus far, has been one of augmentation of more traditional in vitro and in vivo toxicology data. This article focuses on the current available examples of instances where toxicogenomic data has been evaluated in human health risk assessment (e.g., acetochlor and arsenicals) which have been limited to the application of toxicogenomic data to inform mechanism of action. This article reviews the regulatory policy backdrop and highlights important efforts to ultimately achieve regulatory acceptance. A number of research efforts on specific chemicals that were designed for risk assessment purposes have employed mechanism or mode of action hypothesis testing and generating strategies. The strides made by large scale efforts to utilize toxicogenomic data in screening, testing, and risk assessment are also discussed. These efforts include both the refinement of methodologies for performing toxicogenomics studies and analysis of the resultant data sets. The current issues limiting the application of toxicogenomics to define mode or mechanism of action in risk assessment are discussed together with interrelated research needs. In summary, as chemical risk assessment moves away from a single mechanism of action approach toward a toxicity pathway-based paradigm, we envision that toxicogenomic data from multiple technologies (e.g., proteomics, metabolomics, transcriptomics, supportive RT-PCR studies) can be used in conjunction with one another to understand the complexities of multiple, and possibly interacting, pathways affected by chemicals which will impact human health risk assessment.

  3. Wellbore Stability in Oil and Gas Drilling with Chemical-Mechanical Coupling

    Directory of Open Access Journals (Sweden)

    Chuanliang Yan

    2013-01-01

    Full Text Available Wellbore instability in oil and gas drilling is resulted from both mechanical and chemical factors. Hydration is produced in shale formation owing to the influence of the chemical property of drilling fluid. A new experimental method to measure diffusion coefficient of shale hydration is given, and the calculation method of experimental results is introduced. The diffusion coefficient of shale hydration is measured with the downhole temperature and pressure condition, then the penetration migrate law of drilling fluid filtrate around the wellbore is calculated. Furthermore, the changing rules of shale mechanical properties affected by hydration and water absorption are studied through experiments. The relationships between shale mechanical parameters and the water content are established. The wellbore stability model chemical-mechanical coupling is obtained based on the experimental results. Under the action of drilling fluid, hydration makes the shale formation softened and produced the swelling strain after drilling. This will lead to the collapse pressure increases after drilling. The study results provide a reference for studying hydration collapse period of shale.

  4. Research Update: Mechanical properties of metal-organic frameworks – Influence of structure and chemical bonding

    Directory of Open Access Journals (Sweden)

    Wei Li

    2014-12-01

    Full Text Available Metal-organic frameworks (MOFs, a young family of functional materials, have been attracting considerable attention from the chemistry, materials science, and physics communities. In the light of their potential applications in industry and technology, the fundamental mechanical properties of MOFs, which are of critical importance for manufacturing, processing, and performance, need to be addressed and understood. It has been widely accepted that the framework topology, which describes the overall connectivity pattern of the MOF building units, is of vital importance for the mechanical properties. However, recent advances in the area of MOF mechanics reveal that chemistry plays a major role as well. From the viewpoint of materials science, a deep understanding of the influence of chemical effects on MOF mechanics is not only highly desirable for the development of novel functional materials with targeted mechanical response, but also for a better understanding of important properties such as structural flexibility and framework breathing. The present work discusses the intrinsic connection between chemical effects and the mechanical behavior of MOFs through a number of prototypical examples.

  5. Physical and chemical mechanisms in oxide-based resistance random access memory.

    Science.gov (United States)

    Chang, Kuan-Chang; Chang, Ting-Chang; Tsai, Tsung-Ming; Zhang, Rui; Hung, Ya-Chi; Syu, Yong-En; Chang, Yao-Feng; Chen, Min-Chen; Chu, Tian-Jian; Chen, Hsin-Lu; Pan, Chih-Hung; Shih, Chih-Cheng; Zheng, Jin-Cheng; Sze, Simon M

    2015-01-01

    In this review, we provide an overview of our work in resistive switching mechanisms on oxide-based resistance random access memory (RRAM) devices. Based on the investigation of physical and chemical mechanisms, we focus on its materials, device structures, and treatment methods so as to provide an in-depth perspective of state-of-the-art oxide-based RRAM. The critical voltage and constant reaction energy properties were found, which can be used to prospectively modulate voltage and operation time to control RRAM device working performance and forecast material composition. The quantized switching phenomena in RRAM devices were demonstrated at ultra-cryogenic temperature (4K), which is attributed to the atomic-level reaction in metallic filament. In the aspect of chemical mechanisms, we use the Coulomb Faraday theorem to investigate the chemical reaction equations of RRAM for the first time. We can clearly observe that the first-order reaction series is the basis for chemical reaction during reset process in the study. Furthermore, the activation energy of chemical reactions can be extracted by changing temperature during the reset process, from which the oxygen ion reaction process can be found in the RRAM device. As for its materials, silicon oxide is compatible to semiconductor fabrication lines. It is especially promising for the silicon oxide-doped metal technology to be introduced into the industry. Based on that, double-ended graphene oxide-doped silicon oxide based via-structure RRAM with filament self-aligning formation, and self-current limiting operation ability is demonstrated. The outstanding device characteristics are attributed to the oxidation and reduction of graphene oxide flakes formed during the sputter process. Besides, we have also adopted a new concept of supercritical CO2 fluid treatment to efficiently reduce the operation current of RRAM devices for portable electronic applications.

  6. Physico-chemical mechanism for the vapors sensitivity of photoluminescent InP quantum dots

    Science.gov (United States)

    Prosposito, P.; De Angelis, R.; De Matteis, F.; Hatami, F.; Masselink, W. T.; Zhang, H.; Casalboni, M.

    2016-03-01

    InP/InGaP surface quantum dots are interesting materials for optical chemical sensors since they present an intense emission at room temperature, whose intensity changes rapidly and reversibly depending on the composition of the environmental atmosphere. We present here their emission properties by time resolved photoluminescence spectroscopy investigation and we discuss the physico-chemical mechanism behind their sensitivity to the surrounding atmosphere. Photoluminescence transients in inert atmosphere (N2) and in solvent vapours of methanol, clorophorm, acetone and water were measured. The presence of vapors of clorophorm, acetone and water showed a very weak effect on the transient times, while an increase of up to 15% of the decay time was observed for methanol vapour exposure. On the basis of the vapor molecule nature (polarity, proticity, steric hindrance, etc.) and of the interaction of the vapor molecules with the quantum dots surface a sensing mechanism involving quantum dots non-radiative surface states is proposed.

  7. NSR&D FY15 Final Report. Modeling Mechanical, Thermal, and Chemical Effects of Impact

    Energy Technology Data Exchange (ETDEWEB)

    Long, Christopher Curtis [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Ma, Xia [Los Alamos National Lab. (LANL), Los Alamos, NM (United States); Zhang, Duan Zhong [Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

    2015-11-02

    The main goal of this project is to develop a computer model that explains and predicts coupled mechanical, thermal and chemical responses of HE under impact and friction insults. The modeling effort is based on the LANL-developed CartaBlanca code, which is implemented with the dual domain material point (DDMP) method to calculate complex and coupled thermal, chemical and mechanical effects among fluids, solids and the transitions between the states. In FY 15, we have implemented the TEPLA material model for metal and performed preliminary can penetration simulation and begun to link with experiment. Currently, we are working on implementing a shock to detonation transition (SDT) model (SURF) and JWL equation of state.

  8. Endocrine-disrupting chemicals use distinct mechanisms of action to modulate endocrine system function.

    Science.gov (United States)

    Henley, Derek V; Korach, Kenneth S

    2006-06-01

    The term endocrine-disrupting chemicals is used to define a structurally diverse class of synthetic and natural compounds that possess the ability to alter various components of the endocrine system and potentially induce adverse health effects in exposed individuals and populations. Research on these compounds has revealed that they use a variety of both nuclear receptor-mediated and non-receptor-mediated mechanisms to modulate different components of the endocrine system. This review will describe in vitro and in vivo studies that highlight the spectrum of unique mechanisms of action and biological effects of four endocrine-disrupting chemicals--diethylstilbestrol, genistein, di(n-butyl)phthalate, and methoxyacetic acid--to illustrate the diverse and complex nature of this class of compounds.

  9. Chemical reaction mechanisms in solution from brute force computational Arrhenius plots.

    Science.gov (United States)

    Kazemi, Masoud; Åqvist, Johan

    2015-06-01

    Decomposition of activation free energies of chemical reactions, into enthalpic and entropic components, can provide invaluable signatures of mechanistic pathways both in solution and in enzymes. Owing to the large number of degrees of freedom involved in such condensed-phase reactions, the extensive configurational sampling needed for reliable entropy estimates is still beyond the scope of quantum chemical calculations. Here we show, for the hydrolytic deamination of cytidine and dihydrocytidine in water, how direct computer simulations of the temperature dependence of free energy profiles can be used to extract very accurate thermodynamic activation parameters. The simulations are based on empirical valence bond models, and we demonstrate that the energetics obtained is insensitive to whether these are calibrated by quantum mechanical calculations or experimental data. The thermodynamic activation parameters are in remarkable agreement with experiment results and allow discrimination among alternative mechanisms, as well as rationalization of their different activation enthalpies and entropies.

  10. Chemical weathering as a mechanism for the climatic control of bedrock river incision

    Science.gov (United States)

    Murphy, Brendan P.; Johnson, Joel P. L.; Gasparini, Nicole M.; Sklar, Leonard S.

    2016-04-01

    Feedbacks between climate, erosion and tectonics influence the rates of chemical weathering reactions, which can consume atmospheric CO2 and modulate global climate. However, quantitative predictions for the coupling of these feedbacks are limited because the specific mechanisms by which climate controls erosion are poorly understood. Here we show that climate-dependent chemical weathering controls the erodibility of bedrock-floored rivers across a rainfall gradient on the Big Island of Hawai‘i. Field data demonstrate that the physical strength of bedrock in streambeds varies with the degree of chemical weathering, which increases systematically with local rainfall rate. We find that incorporating the quantified relationships between local rainfall and erodibility into a commonly used river incision model is necessary to predict the rates and patterns of downcutting of these rivers. In contrast to using only precipitation-dependent river discharge to explain the climatic control of bedrock river incision, the mechanism of chemical weathering can explain strong coupling between local climate and river incision.

  11. Reduced chemical kinetic mechanisms for NOx emission prediction in biomass combustion

    DEFF Research Database (Denmark)

    Houshfar, Ehsan; Skreiberg, Øyvind; Glarborg, Peter;

    2012-01-01

    Because of the complex composition of biomass, the chemical mechanism contains many different species and therefore a large number of reactions. Although biomass gas‐phase combustion is fairly well researched and understood, the proposed mechanisms are still complex and need very long computational...... time and powerful hardware resources. A reduction of the mechanism for biomass volatile oxidation has therefore been performed to avoid these difficulties. The selected detailed mechanism in this study contains 81 species and 703 elementary reactions. Necessity analysis is used to determine which......‐ and low‐temperature range with 26 and 52 species, respectively. The modeling conditions are selected in a way to mimic values in the range of temperature 700–1400°C, excess air ratio 0.8–3.3, and four different residence times: 1, 0.1, 0.01, and 0.001 s, since these variables are the main affecting...

  12. Thermal Analysis for Monitoring Effects of Shock-Induced Physical, Mechanical, and Chemical Changes in Materials

    Science.gov (United States)

    2015-01-19

    chemical reactions as a function of temperature. Since the DSC is at constant pressure, heat flow measured is equivalent to enthalpy changes: Here...mechanical activation; reactive materials; anaerobic reactions REPORT DOCUMENTATION PAGE 11. SPONSOR/MONITOR’S REPORT NUMBER(S) 10. SPONSOR/MONITOR’S...be of benefit to our other DoD supported work on understanding of shock-activation leading to reactions in energetic/reactive materials. The thermal

  13. Planarization using chemical mechanical planarization (CMP) on a 16-megabit SRAM with quadruple polysilicon stacks

    Science.gov (United States)

    Perry, Kathleen A.; Radhakrishna, Sandya; Lage, Craig; Nkansah, Franklin; Pol, Victor; Kobayashi, Thom; West, Jeff P.; Crabtree, Phil

    1994-09-01

    Chemical mechanical planarization (CMP) has been used to fabricate a 0.35 micrometers 16 Meg SRAM with quadruple polysilicon stacks. The use of CMP results in complete planarization of over one micron of topography. CMP planarization results in improved photolithography depth of field when compared to standard resist etchback planarization (REB). Data from a lot processed using CMP at contact dielectric and interlayer dielectric is compared to a lot that was processed using standard REB for planarization.

  14. Processing of poly(lactic acid): characterization of chemical structure, thermal stability and mechanical properties

    OpenAIRE

    Carrasco Alonso, Félix Ángel; Pagès Figueras, Pere; Gamez Pérez, José; Santana Pérez, Orlando Onofre; Maspoch Rulduà, Mª Lluïsa

    2010-01-01

    The processing of poly(lactic acid) (injection and extrusion/injection) as well as annealing of processed materials were studied in order to analyze the variation of its chemical structure, thermal degradation and mechanical properties. Processing of PLA was responsible for a decrease in molecular weight, as determined by GPC, due to chain scission. The degree of crystallinity was evaluated by means of differential scanning calorimetry and X-ray diffraction. It was found that mech...

  15. Protein structure validation and refinement using amide proton chemical shifts derived from quantum mechanics

    CERN Document Server

    Christensen, Anders S; Borg, Mikael; Boomsma, Wouter; Lindorff-Larsen, Kresten; Hamelryck, Thomas; Jensen, Jan H

    2013-01-01

    We present the ProCS method for the rapid and accurate prediction of protein backbone amide proton chemical shifts - sensitive probes of the geometry of key hydrogen bonds that determine protein structure. ProCS is parameterized against quantum mechanical (QM) calculations and reproduces high level QM results obtained for a small protein with an RMSD of 0.25 ppm (r = 0.94). ProCS is interfaced with the PHAISTOS protein simulation program and is used to infer statistical protein ensembles that reflect experimentally measured amide proton chemical shift values. Such chemical shift-based structural refinements, starting from high-resolution X-ray structures of Protein G, ubiquitin, and SMN Tudor Domain, result in average chemical shifts, hydrogen bond geometries, and trans-hydrogen bond (h3JNC') spin-spin coupling constants that are in excellent agreement with experiment. We show that the structural sensitivity of the QM-based amide proton chemical shift predictions is needed to refine protein structures to this...

  16. Potential role of redox cycling as a mechanism for chemical teratogenesis

    Energy Technology Data Exchange (ETDEWEB)

    Juchau, M.R.; Fantel, A.G.; Harris, C.; Beyer, B.K.

    1986-12-01

    A survey of the literature indicates that several chemicals whose reduced metabolites are capable of undergoing redox cycling in biological systems also possess significant teratogenic properties when tested in vivo. The authors have initiated investigations to determine whether the embryotoxic effects of such chemicals could result from their redox cycling properties and whether redox cycling could be an important mechanism in chemical teratogenesis. In order to obviate the potentially confounding influences of maternal factors, the initial studies have been performed with a whole embryo culture system with redox cycling agents added directly to the culture medium. Several representative redox cycling agents including doxorubicin, paraquat, a series of nitroheterocycles, nitrosofluorene, and diethylstilbestrol (converted metabolically to redox cycling quinone/semiquinone radicals) have been investigated thus far. The nitroheterocycles which bear nitro groups with comparatively high redox potentials produced a striking, asymmetric defect involving primarily the right half of the prosencephalic and mesencephalic regions. The effect was exacerbated under conditions of low O/sub 2/ tension. Accumulated data to date strongly suggest that reduction of the nitro group is an essential feature in the embryotoxic mechanism. Quinones (doxorubicin, paraquat) and compounds metabolically converted to quinones (diethylstilbestrol) appeared to produce embryotoxic effects via mechanisms not associated with redox cycling. Nitrosofluorene embryotoxicity was markedly exacerbated by changes in both intra- and extracellular glutathione levels, but definitive dependence on a radical-mediated effect or redox cycling was not demonstrated.

  17. Systematic lumping of complex tropospheric chemical mechanisms using a time-scale based approach

    Directory of Open Access Journals (Sweden)

    L. E. Whitehouse

    2004-07-01

    Full Text Available This paper presents a formal method of species lumping that can be applied automatically to intermediate compounds within detailed and complex tropospheric chemical reaction schemes. The method is based on grouping species with reference to their chemical lifetimes and reactivity structures. A method for determining the forward and reverse transformations between individual and lumped compounds is developed. Preliminary application to the Leeds Master Chemical Mechanism (MCMv2.0 has led to the removal of 734 species and 1777 reactions from the scheme, with minimal degradation of accuracy across a wide range of test trajectories relevant to polluted tropospheric conditions. The lumped groups are seen to relate to groups of peroxy acyl nitrates, nitrates, carbonates, oxepins, substituted phenols, oxeacids and peracids with similar lifetimes and reaction rates with OH. In combination with other reduction techniques, such as sensitivity analysis and the application of the quasi-steady state approximation (QSSA, a reduced mechanism has been developed that contains 35% of the number of species and 40% of the number of reactions compared to the full mechanism. This has led to a speed up of a factor of 8 in terms of computer calculation time within box model simulations.

  18. Electrocoagulation versus chemical coagulation: coagulation/flocculation mechanisms and resulting floc characteristics.

    Science.gov (United States)

    Harif, Tali; Khai, Moti; Adin, Avner

    2012-06-15

    Electrocoagulation (EC) and chemical coagulation (CC) are employed in water treatment for particle removal. Although both are used for similar purposes, they differ in their dosing method - in EC the coagulant is added by electrolytic oxidation of an appropriate anode material, while in CC dissolution of a chemical coagulant is used. These different methods in fact induce different chemical environments, which should impact coagulation/flocculation mechanisms and subsequent floc formation. Hence, the process implications when choosing which to apply should be significant. This study elucidates differences in coagulation/flocculation mechanisms in EC versus CC and their subsequent effect on floc growth kinetics and structural evolution. A buffered kaolin suspension served as a representative solution that underwent EC and CC by applying aluminum via additive dosing regime in batch mode. In EC an aluminum anode generated the active species while in CC, commercial alum was used. Aluminum equivalent doses were applied, at initial pH values of 5, 6.5 and 8, while samples were taken over pre-determined time intervals, and analyzed for pH, particle size distribution, ζ potential, and structural properties. EC generated fragile flocs, compared to CC, over a wider pH range, at a substantially higher growth rate, that were prone to restructuring and compaction. The results suggest that the flocculation mechanism governing EC in sweep floc conditions is of Diffusion Limited Cluster Aggregation (DCLA) nature, versus a Reaction Limited Cluster Aggregation (RLCA) type in CC. The implications of these differences are discussed.

  19. Use of polishing pond effluents to cultivate lettuce (Lactuca sativa) in a hydroponic system.

    Science.gov (United States)

    Keller, R; Perin, K; Souza, W G; Cruz, L S; Zandonade, E; Cassini, S T A; Goncalves, R F

    2008-01-01

    The sanitary quality and productivity of hydroponic lettuce (Lactuca sativa L.) plants cultivated under greenhouse conditions and treated with effluent from anaerobic reactor + polishing pond followed by physical-chemical treatment was evaluated. Two hydroponic cultivations were performed at summer and winter time at Vitoria-ES, Brazil. The treatments for both cultivations were: T1) conventional nutrient solution, T2) effluent from physical-chemical treatment, T3) effluent from polishing pond, and T4) effluent from polishing pond with 50% dilution. The plants were evaluated for microbial contamination, productivity and nutrient content. In all cases, no significant microbial contamination of lettuce was detected and the levels of macronutrients in the shoot system were similar to those in published reports. In the experiments from summer season, the treatments T1 and T2 resulted in higher production than the T3 and T4 treatments. Plants from T3 and T4 had a less developed root system as a result of reduced oxygenation from competition with the higher algae biomass content from the polishing pond effluent. In the winter season, the effect of the algal biomass was pronounced only in the T3 treatment (undiluted effluent from polishing pond). In conclusion, hydroponic cultivation of lettuce with pond effluent is suitable as a complement to water and nutrients for plants.

  20. Polishing X-ray Mirror Mandrel

    Science.gov (United States)

    1999-01-01

    NASA's Space Optics Manufacturing Center has been working to expand our view of the universe via sophisticated new telescopes. The Optics Center's goal is to develop low-cost, advanced space optics technologies for the NASA program in the 21st century - including the long-term goal of imaging Earth-like planets in distant solar systems. To reduce the cost of mirror fabrication, Marshall Space Flight Center (MSFC) has developed replication techniques, the machinery, and materials to replicate electro-formed nickel mirrors. The process allows fabricating precisely shaped mandrels to be used and reused as masters for replicating high-quality mirrors. MSFC's Space Optics Manufacturing Technology Center (SOMTC) has grinding and polishing equipment ranging from conventional spindles to custom-designed polishers. These capabilities allow us to grind precisely and polish a variety of optical devices, including x-ray mirror mandrels. This image shows Charlie Griffith polishing the half-meter mandrel at SOMTC.

  1. New Environmental Practices in Polish Production Firms

    DEFF Research Database (Denmark)

    Kræmer, Trine Pipi

    2002-01-01

    Based on five case studies in Poland, the paper discusses, how a specific environmental policy influences the firms? industrial environmental practices. The study illustrates, how the Polish environmental policy, dominated by environmental charges on emissions, is extremely effective in improving...

  2. Polish women's experiences of breastfeeding in Ireland.

    Science.gov (United States)

    Szafranska, Marcelina; Gallagher, Louise

    2016-01-01

    Exclusive breastfeeding among Polish mothers at three-four months (38.6 per cent) is in keeping with the low rates of breastfeeding in Ireland overall (Begley et al 2008), and suggests that Polish women have begun to adopt the infant feeding practices of Irish women. Therefore, the aim of this study was to explore the factors that influence Polish women's decisions to initiate and continue breastfeeding in Ireland. A descriptive qualitative approach was utilised to explore participants' perspectives of breastfeeding. Results showed that professional and family support are key to a successful breastfeeding experience for these mothers. Recommendations include further individualised support in order to meet the needs of Polish women breastfeeding in Ireland.

  3. 大气化学机理的发展及应用%Development and Application of Atmospheric Chemical Mechanisms

    Institute of Scientific and Technical Information of China (English)

    石玉珍; 徐永福; 贾龙

    2012-01-01

    Atmospheric chemical mechanism is one of the most important components to study photochemical processes and develop air quality models. The development and application of several atmospheric chemical mechanisms were summarized. The simplified chemical mechanisms include Carbon Bond Mechanism (CBM), Statewide Air Pollution Research Center mechanism (SAPRC), Regional Acid Deposition Mechanism (RADM), and Regional Atmospheric Chemical Mechanism (RACM) which have been widely used in the past decades and the explicit chemical mechanisms contain Master Chemical Mechanism (MCM) and Common Representative Intermediates (CRI) which were developed rapidly in the past few years. The history, species, and lump styles of these mechanisms were compared. Meanwhile, the research of the evaluation to chemical mechanism by using chamber experiment data and the application of these chemical mechanisms in model development also summarized. Besides, the further demand to the development and improvement of chemical mechanisms was put forward.%大气化学机理是研究大气化学过程的重要手段和方法之一,也是发展空气质量模式必不可少的重要组成部分.作者综述了几种应用广泛的简化机理——碳键机理(Carbon Bond Mechanism,CBM)、加州大气污染研究中心机理(Statewide Air Pollution Research Center mechanism,SAPRC)、区域酸沉降机理(Regional Acid Deposition Mechanism,RADM)、区域大气化学机理(Regional Atmospheric Chemical Mechanism,RACM)以及详细化学机理——主要大气化学机理(Master Chemical Mechanism,MCM)和共同代表性中间体机理(Common Representative Intermediates,CRI)的发展及应用.对上述大气化学机理的产生、发展、包含的物种类型、集总方式等方面进行了对比分析,总结了采用烟雾箱数据评价大气化学机理的研究成果以及大气化学机理在模式发展方面的应用,并对大气化学机理的进一步发展与完善提出了需求.

  4. Identifying the causes of differences in ozone production from the CB05 and CBMIV chemical mechanisms

    Directory of Open Access Journals (Sweden)

    R. D. Saylor

    2012-02-01

    Full Text Available An investigation was conducted to identify the mechanistic differences between two versions of the carbon bond gas-phase chemical mechanism (CB05 and CBMIV which consistently lead to larger ground-level ozone concentrations being produced in the CB05 version of the National Air Quality Forecasting Capability (NAQFC modeling system even though the two parallel forecast systems utilize the same meteorology and base emissions and similar initial and boundary conditions. Box models of each of the mechanisms as they are implemented in the NAQFC were created and a set of 12 sensitivity simulations was designed. The sensitivity simulations independently probed the conceptual mechanistic differences between CB05 and CBMIV and were exercised over a 45-scenario simulation suite designed to emulate the wide range of chemical regimes encountered in a continental-scale atmospheric chemistry model. Results of the sensitivity simulations indicate that two sets of reactions that were included in the CB05 mechanism, but which were absent from the CBMIV mechanism, are the primary causes of the greater ozone production in the CB05 version of the NAQFC. One set of reactions recycles the higher organic peroxide species of CB05 (ROOH, resulting in additional photochemically reactive products that act to produce additional ozone in some chemical regimes. The other set of reactions recycles reactive nitrogen from less reactive forms back to NO2, increasing the effective NOx concentration of the system. In particular, the organic nitrate species (NTR, which was a terminal product for reactive nitrogen in the CBMIV mechanism, acts as a reservoir species in CB05 to redistribute NOx from major source areas to potentially NOx-sensitive areas where additional ozone may be produced in areas remote from direct NOx sources.

  5. Identifying the causes of differences in ozone production from the CB05 and CBMIV chemical mechanisms

    Directory of Open Access Journals (Sweden)

    R. D. Saylor

    2011-10-01

    Full Text Available An investigation was conducted to identify the mechanistic differences between two versions of the carbon bond gas-phase chemical mechanism (CB05 and CBMIV which consistently lead to larger ground-level ozone concentrations being produced in the CB05 version of the National Air Quality Forecasting Capability (NAQFC modeling system even though the two parallel forecast systems utilize the same meteorology and base emissions and similar initial and boundary conditions. Box models of each of the mechanisms as they are implemented in the NAQFC were created and a set of 12 sensitivity simulations was designed. The sensitivity simulations independently probed the conceptual mechanistic differences between CB05 and CBMIV and were exercised over a 45-scenario simulation suite designed to emulate the wide range of chemical regimes encountered in a continental-scale atmospheric chemistry model. Results of the sensitivity simulations indicate that two sets of reactions that were included in the CB05 mechanism, but which were absent from the CBMIV mechanism, are the primary causes of the greater ozone production in the CB05 version of the NAQFC. One set of reactions recycles the higher organic peroxide species of CB05 (ROOH, resulting in additional photochemically reactive products that act to produce additional ozone in some chemical regimes. The other set of reactions recycles reactive nitrogen from less reactive forms back to NO2, increasing the effective NOx concentration of the system. In particular, the organic nitrate species (NTR, which was a terminal product for reactive nitrogen in the CBMIV mechanism, acts as a reservoir species in CB05 to redistribute NOx from major source areas to potentially NOx-sensitive areas where additional ozone may be produced in areas remote from direct NOx sources.

  6. Experimental Polish-Lithuanian Corpus with the Semantic Annotation Elements

    Directory of Open Access Journals (Sweden)

    Danuta Roszko

    2015-06-01

    Full Text Available Experimental Polish-Lithuanian Corpus with the Semantic Annotation Elements In the article the authors present the experimental Polish-Lithuanian corpus (ECorpPL-LT formed for the idea of Polish-Lithuanian theoretical contrastive studies, a Polish-Lithuanian electronic dictionary, and as help for a sworn translator. The semantic annotation being brought into ECorpPL-LT is extremely useful in Polish-Lithuanian contrastive studies, and also proves helpful in translation work.

  7. Surface morphology changes of acrylic resins during finishing and polishing phases

    Directory of Open Access Journals (Sweden)

    Glaucio Serra

    2013-12-01

    Full Text Available INTRODUCTION: The finishing and polishing phases are essential to improve smoothness and shining on the surface of acrylic resins used to make removable orthodontic appliances. A good surface finishing reduces roughness, which facilitates hygiene, prevents staining and provides greater comfort to the patients. OBJECTIVE: The aim of this paper was to analyze the changes on surface morphology of acrylic resins during finishing and polishing phases. METHODS: Thirty discs (10 mm in diameter and 5 mm in length were made with acrylic resin and randomly divided into ten groups. The control group did not receive any treatment while the other groups received gradual finishing and polishing. The last group received the entire finishing and polishing procedures. Surface morphology was qualitatively analyzed through scanning electron microscopy and quantitatively analyzed through a laser profilometer test. RESULTS: The acrylic resin surfaces without treatment showed bubbles which were not observed in the subsequent phases. Wearing out with multilaminated burs, finishing with wood sandpaper and finishing with water sandpaper resulted in surfaces with decreasing irregularities. The surfaces that were polished with pumice and with low abrasive liquids showed high superficial smoothness. CONCLUSION: Highly smooth acrylic resin surfaces can be obtained after mechanical finishing and polishing performed with multilaminated burs, wood sandpaper, water sandpaper, pumice and low abrasive liquids.

  8. Comparison of Moringa Oleifera seeds oil characterization produced chemically and mechanically

    Science.gov (United States)

    Eman, N. A.; Muhamad, K. N. S.

    2016-06-01

    It is established that virtually every part of the Moringa oleifera tree (leaves, stem, bark, root, flowers, seeds, and seeds oil) are beneficial in some way with great benefits to human being. The tree is rich in proteins, vitamins, minerals. All Moringa oleifera food products have a very high nutritional value. They are eaten directly as food, as supplements, and as seasonings as well as fodder for animals. The purpose of this research is to investigate the effect of seeds particle size on oil extraction using chemical method (solvent extraction). Also, to compare Moringa oleifera seeds oil properties which are produced chemically (solvent extraction) and mechanically (mechanical press). The Moringa oleifera seeds were grinded, sieved, and the oil was extracted using soxhlet extraction technique with n-Hexane using three different size of sample (2mm, 1mm, and 500μm). The average oil yield was 36.1%, 40.80%, and 41.5% for 2mm, 1mm, and 500μm particle size, respectively. The properties of Moringa oleifera seeds oil were: density of 873 kg/m3, and 880 kg/m3, kinematic viscosity of 42.2mm2/s and 9.12mm2/s for the mechanical and chemical method, respectively. pH, cloud point and pour point were same for oil produced with both methods which is 6, 18°C and 12°C, respectively. For the fatty acids, the oleic acid is present with high percentage of 75.39%, and 73.60% from chemical and mechanical method, respectively. Other fatty acids are present as well in both samples which are (Gadoleic acid, Behenic acid, Palmitic acid) which are with lower percentage of 2.54%, 5.83%, and 5.73%, respectively in chemical method oil, while they present as 2.40%, 6.73%, and 6.04%, respectively in mechanical method oil. In conclusion, the results showed that both methods can produce oil with high quality. Moringa oleifera seeds oil appear to be an acceptable good source for oil rich in oleic acid which is equal to olive oil quality, that can be consumed in Malaysia where the olive oil

  9. Biomass use in chemical and mechanical pulping with biomass-based energy supply

    Energy Technology Data Exchange (ETDEWEB)

    Holmberg, Jonas M.; Gustavsson, Leif [Department of Engineering Physics and Mathematics, Mid Sweden University, SE-831 25 Oestersund (Sweden)

    2007-12-15

    The pulp and paper industry is energy intensive and consumes large amounts of wood. Biomass is a limited resource and its efficient use is therefore important. In this study, the total amount of biomass used for pulp and for energy is estimated for the production of several woodfree (containing only chemical pulp) and mechanical (containing mechanical pulp) printing paper products, under Swedish conditions. Chemical pulp mills today are largely self-sufficient in energy while mechanical pulp mills depend on large amounts of external electricity. Technically, all energy used in pulp- and papermaking can be biomass based. Here, we assume that all energy used, including external electricity and motor fuels, is based on forest biomass. The whole cradle-to-gate chain is included in the analyses. The results indicate that the total amount of biomass required per tonne paper is slightly lower for woodfree than for mechanical paper. For the biomass use per paper area, the paper grammage is decisive. If the grammage can be lowered by increasing the proportion of mechanical pulp, this may lower the biomass use per paper area, despite the higher biomass use per unit mass in mechanical paper. In the production of woodfree paper, energy recovery from residues in the mill accounts for most of the biomass use, while external electricity production accounts for the largest part for mechanical paper. Motor fuel production accounts for 5-7% of the biomass use. The biomass contained in the final paper product is 21-42% of the total biomass use, indicating that waste paper recovery is important. The biomass use was found to be about 15-17% lower for modelled, modern mills compared with mills representative of today's average technology. (author)

  10. Conformal polishing approach: Tool footprint analysis

    Directory of Open Access Journals (Sweden)

    José A Dieste

    2016-02-01

    Full Text Available Polishing process is one of the most critical manufacturing processes during a metal part production because it determines the final quality of the product. Free-form surface polishing is a handmade process with lots of rejected parts, scrap generation and time and energy consumption. Two different research lines are being developed: prediction models of the final surface quality parameters and an analysis of the amount of material removed depending on the polishing parameters to predict the tool footprint during the polishing task. This research lays the foundations for a future automatic conformal polishing system. It is based on rotational and translational tool with dry abrasive in the front mounted at the end of a robot. A tool to part concept is used, useful for large or heavy workpieces. Results are applied on different curved parts typically used in tooling industry, aeronautics or automotive. A mathematical model has been developed to predict the amount of material removed in function of polishing parameters. Model has been fitted for different abrasives and raw materials. Results have shown deviations under 20% that implies a reliable and controllable process. Smaller amount of material can be removed in controlled areas of a three-dimensional workpiece.

  11. Interculutral Polish-Chinese QQing

    Directory of Open Access Journals (Sweden)

    Elżbieta Gajek

    2012-12-01

    Full Text Available Working in tandem with the use of information and communication technologies is well-known and frequently used as a method of supporting learning of foreign languages in authentic communication. It is based on a constructivist approach to teaching. In the reported case study Polish and Chinese students discussed in English preprepared topics. The work shows the potential of e-learning at the micro level, as the language and intercultural task is implemented into an academic course without modification of the objectives and learning outcomes of the course. Evaluation carried out at the end of the project indicates that both groups perceived the task as a significant linguistic, cultural and personal experience. They stressed the importance of sharing “culture for culture” as the partner culture was new for most of them. The ability to talk and respond to information which was often strange, from the point of view of their own culture, allowed for learning intercultural competence ̔in action’.

  12. Influences of polishing on return loss of optical fiber connectors

    Institute of Scientific and Technical Information of China (English)

    DUAN Ji-an; LIU De-fu; ZHONG Jue

    2005-01-01

    With Al2O3 and SiO2 as polishing medium, under different polishing conditions, e.g. with different polishing pressure, polishing time and polishing fluid, the influences of polishing treatment on the return loss of optical fiber connectors were investigated. The return loss of optical fiber connectors is 32 - 38 dB before polishing. The results show that dry polishing(i. e. no polishing fluid) with Al2O3 has less influence on return loss of optical fiber connectors, while dry polishing with SiO2 reduces return loss to about 20 dB because of the end-face of optical fiber contaminated. The wet polishing(i. e. using distilled water as polishing fluid) with Al2O3 or SiO2 can increase return loss to 45 -50 dB, but wet polishing with Al2 O3 may produce optical fiber undercut depth of 80 - 140 nm. Wet polishing with SiO2 should be preferentially selected for optical fiber connectors and polishing time should be controlled within 20 - 30 s.

  13. The Radical Pair Mechanism and the Avian Chemical Compass: Quantum Coherence and Entanglement

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Yiteng [Purdue Univ., West Lafayette, IN (United States); Kais, Sabre [Purdue Univ., West Lafayette, IN (United States); Berman, Gennady Petrovich [Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

    2015-02-02

    We review the spin radical pair mechanism which is a promising explanation of avian navigation. This mechanism is based on the dependence of product yields on 1) the hyperfine interaction involving electron spins and neighboring nuclear spins and 2) the intensity and orientation of the geomagnetic field. One surprising result is that even at ambient conditions quantum entanglement of electron spins can play an important role in avian magnetoreception. This review describes the general scheme of chemical reactions involving radical pairs generated from singlet and triplet precursors; the spin dynamics of the radical pairs; and the magnetic field dependence of product yields caused by the radical pair mechanism. The main part of the review includes a description of the chemical compass in birds. We review: the general properties of the avian compass; the basic scheme of the radical pair mechanism; the reaction kinetics in cryptochrome; quantum coherence and entanglement in the avian compass; and the effects of noise. We believe that the quantum avian compass can play an important role in avian navigation and can also provide the foundation for a new generation of sensitive and selective magnetic-sensing nano-devices.

  14. Effects of surface polishing and annealing on the optical conductivity of intermetallic compounds

    CERN Document Server

    Rhee, J Y

    1999-01-01

    The optical conductivity spectra of several intermetallic compounds were measured by spectroscopic ellipsometry. Three spectra were measured for each compound; just after the sample was mechanically polished, at high temperature, and after the sample was annealed at 110 .deg. C for at least one day and cooled to room temperature. An equiatomic FeTi alloy showed the typical effects of annealing after mechanical polishing of surface. The spectrum after annealing had a larger magnitude and sharper structures than the spectrum before annealing. We also observed shifts of peaks in the spectrum. A relatively low-temperature annealing gave rise to unexpectedly substantial effects, and the effects were explained by recrystallization and/or a disorder -> order transition of the surface of the sample which was damaged and, hence, became highly disordered by mechanical polishing. Similar effects were also observed when the sample temperature was lowered. The observed changes upon annealing could partly be explained by p...

  15. Effects of bioleaching on the mechanical and chemical properties of waste rocks

    Science.gov (United States)

    Yin, Sheng-Hua; Wu, Ai-Xiang; Wang, Shao-Yong; Ai, Chun-Ming

    2012-01-01

    Bioleaching processes cause dramatic changes in the mechanical and chemical properties of waste rocks, and play an important role in metal recovery and dump stability. This study focused on the characteristics of waste rocks subjected to bioleaching. A series of experiments were conducted to investigate the evolution of rock properties during the bioleaching process. Mechanical behaviors of the leached waste rocks, such as failure patterns, normal stress, shear strength, and cohesion were determined through mechanical tests. The results of SEM imaging show considerable differences in the surface morphology of leached rocks located at different parts of the dump. The mineralogical content of the leached rocks reflects the extent of dissolution and precipitation during bioleaching. The dump porosity and rock size change under the effect of dissolution, precipitation, and clay transportation. The particle size of the leached rocks decreased due to the loss of rock integrity and the conversion of dry precipitation into fine particles.

  16. Mechanisms of chemical-induced innate immunity in allergic contact dermatitis.

    Science.gov (United States)

    Martin, S F; Esser, P R; Weber, F C; Jakob, T; Freudenberg, M A; Schmidt, M; Goebeler, M

    2011-09-01

    Allergic contact dermatitis (ACD) is one of the most prevalent occupational skin diseases and causes severe and long-lasting health problems in the case of chronification. It is initiated by an innate inflammatory immune response to skin contact with low molecular weight chemicals that results in the priming of chemical-specific, skin-homing CD8(+) Tc1/Tc17 and CD4(+) Th1/Th17 cells. Following this sensitization step, T lymphocytes infiltrate the inflamed skin upon challenge with the same chemical. The T cells then exert cytotoxic function and secrete inflammatory mediators to produce an eczematous skin reaction. The recent characterization of the mechanisms underlying the innate inflammatory response has revealed that contact allergens activate innate effector mechanisms and signalling pathways that are also involved in anti-infectious immunity. This emerging analogy implies infection as a potential trigger or amplifier of the sensitization to contact allergens. Moreover, new mechanistic insights into the induction of ACD identify potential targets for preventive and therapeutic intervention. We summarize here the latest findings in this area of research.

  17. Biological effects of mechanically and chemically dispersed oil on the Icelandic scallop (Chlamys islandica).

    Science.gov (United States)

    Frantzen, Marianne; Regoli, Francesco; Ambrose, William G; Nahrgang, Jasmine; Geraudie, Perrine; Benedetti, Maura; Locke, William L; Camus, Lionel

    2016-05-01

    This study aimed to simulate conditions in which dispersant (Dasic NS) might be used to combat an oil spill in coastal sub-Arctic water of limited depth and water exchange in order to produce input data for Net Environmental Benefit Analysis (NEBA) of Arctic and sub-Arctic coastal areas. Concentration dependent differences in acute responses and long-term effects of a 48h acute exposure to dispersed oil, with and without the application of a chemical dispersant, were assessed on the Arctic filter feeding bivalve Chlamys islandica. Icelandic scallops were exposed for 48h to a range of spiked concentrations of mechanically and chemically dispersed oil. Short-term effects were assessed in terms of lysosomal membrane stability, superoxide dismutase, catalase, gluthatione S-transferases, glutathione peroxidases, glutathione reductase, glutathione, total oxyradical scavenging capacity, lipid peroxidation and peroxisomal proliferation. Post-exposure survival, growth and reproductive investment were followed for 2 months to evaluate any long-term consequence. Generally, similar effects were observed in scallops exposed to mechanically and chemically dispersed oil. Limited short-term effects were observed after 48h, suggesting that a different timing would be required for measuring the possible onset of such effects. There was a concentration dependent increase in cumulative post-exposure mortality, but long-term effects on gonadosomatic index, somatic growth/condition factor did not differ among treatments.

  18. A constitutive model for bonded geomaterials subject to mechanical and/or chemical degradation

    Science.gov (United States)

    Nova, R.; Castellanza, R.; Tamagnini, C.

    2003-08-01

    The mechanical behaviour of bonded geomaterials is described by means of an elastoplastic strain-hardening model. The internal variables, taking into account the history of the material, depend on the plastic strains experienced and on a conveniently defined scalar measure of damage induced by weathering and/or chemical degradation.For the sake of simplicity, it is assumed that only internal variables are affected by mechanical and chemical history of the material. Despite this simplifying assumption, it can be shown that many interesting phenomena exhibited by weathered bonded geomaterials can be successfully described. For instance, (i) the transition from brittle to ductile behaviour with increasing pressure of a calcarenite with collapsing internal structure, (ii) the complex behaviour of chalk and other calcareous materials in oedometric tests, (iii) the chemically induced variation of the stress and strain state of such kind of materials, are all phenomena that can be qualitatively reproduced. Several comparisons with experimental data show that the model can capture the observed behaviour also quantitatively.

  19. Effect of chemical treatment of Kevlar fibers on mechanical interfacial properties of composites.

    Science.gov (United States)

    Park, Soo-Jin; Seo, Min-Kang; Ma, Tae-Jun; Lee, Douk-Rae

    2002-08-01

    In this work, the effects of chemical treatment on Kevlar 29 fibers have been studied in a composite system. The surface characteristics of Kevlar 29 fibers were characterized by pH, acid-base value, X-ray photoelectron spectroscopy (XPS), and FT-IR. The mechanical interfacial properties of the final composites were studied by interlaminar shear strength (ILSS), critical stress intensity factor (K(IC)), and specific fracture energy (G(IC)). Also, impact properties of the composites were investigated in the context of differentiating between initiation and propagation energies and ductile index (DI) along with maximum force and total energy. As a result, it was found that chemical treatment with phosphoric acid solution significantly affected the degree of adhesion at interfaces between fibers and resin matrix, resulting in improved mechanical interfacial strength in the composites. This was probably due to the presence of chemical polar groups on Kevlar surfaces, leading to an increment of interfacial binding force between fibers and matrix in a composite system.

  20. Integration of large chemical kinetic mechanisms via exponential methods with Krylov approximations to Jacobian matrix functions

    KAUST Repository

    Bisetti, Fabrizio

    2012-06-01

    Recent trends in hydrocarbon fuel research indicate that the number of species and reactions in chemical kinetic mechanisms is rapidly increasing in an effort to provide predictive capabilities for fuels of practical interest. In order to cope with the computational cost associated with the time integration of stiff, large chemical systems, a novel approach is proposed. The approach combines an exponential integrator and Krylov subspace approximations to the exponential function of the Jacobian matrix. The components of the approach are described in detail and applied to the ignition of stoichiometric methane-air and iso-octane-air mixtures, here described by two widely adopted chemical kinetic mechanisms. The approach is found to be robust even at relatively large time steps and the global error displays a nominal third-order convergence. The performance of the approach is improved by utilising an adaptive algorithm for the selection of the Krylov subspace size, which guarantees an approximation to the matrix exponential within user-defined error tolerance. The Krylov projection of the Jacobian matrix onto a low-dimensional space is interpreted as a local model reduction with a well-defined error control strategy. Finally, the performance of the approach is discussed with regard to the optimal selection of the parameters governing the accuracy of its individual components. © 2012 Copyright Taylor and Francis Group, LLC.

  1. Insights into the mechanism and catalysis of the native chemical ligation reaction.

    Science.gov (United States)

    Johnson, Erik C B; Kent, Stephen B H

    2006-05-24

    Native chemical ligation of unprotected peptide segments involves reaction between a peptide-alpha-thioester and a cysteine-peptide, to yield a product with a native amide bond at the ligation site. Peptide-alpha-thioalkyl esters are commonly used because of their ease of preparation. These thioalkyl esters are rather unreactive so the ligation reaction is catalyzed by in situ transthioesterification with thiol additives. The most common thiol catalysts used to date have been either a mixture of thiophenol/benzyl mercaptan, or the alkanethiol MESNA. Despite the use of these thiol catalysts, ligation reactions typically take 24-48 h. To gain insight into the mechanism of native chemical ligaton and in order to find a better catalyst, we investigated the use of a number of thiol compounds. Substituted thiophenols with pK(a) > 6 were found to best combine the ability to exchange rapidly and completely with thioalkyl esters, and to then act as effective leaving groups in reaction of the peptide-thioester with the thiol side chain of a cysteine-peptide. A highly effective and practical catalyst was (4-carboxylmethyl)thiophenol ('MPAA'), a nonmalodorous, water-soluble thiol. Use of MPAA gave an order of magnitude faster reaction in model studies of native chemical ligation and in the synthesis of a small protein, turkey ovomucoid third domain (OMTKY3). MPAA should find broad use in native chemical ligation and in the total synthesis of proteins.

  2. A comparison of chemical mechanisms using Tagged Ozone Production Potential (TOPP analysis

    Directory of Open Access Journals (Sweden)

    J. Coates

    2015-04-01

    Full Text Available Ground-level ozone is a secondary pollutant produced photochemically from reactions of NOx with peroxy radicals produced during VOC degradation. Chemical transport models use simplified representations of this complex gas-phase chemistry to predict O3 levels and inform emission control strategies. Accurate representation of O3 production chemistry is vital for effective predictions. In this study, VOC degradation chemistry in simplified mechanisms is compared to that in the near-explicit MCM mechanism using a boxmodel and by "tagging" all organic degradation products over multi-day runs, thus calculating the Tagged Ozone Production Potential (TOPP for a selection of VOC representative of urban airmasses. Simplified mechanisms that aggregate VOC degradation products instead of aggregating emitted VOC produce comparable amounts of O3 from VOC degradation to the MCM. First day TOPP values are similar across mechanisms for most VOC, with larger discrepancies arising over the course of the model run. Aromatic and unsaturated aliphatic VOC have largest inter-mechanisms differences on the first day, while alkanes show largest differences on the second day. Simplified mechanisms break down VOC into smaller sized degradation products on the first day faster than the MCM impacting the total amount of O3 produced on subsequent days due to secondary chemistry.

  3. CHEMICALS

    CERN Multimedia

    Medical Service

    2002-01-01

    It is reminded that all persons who use chemicals must inform CERN's Chemistry Service (TIS-GS-GC) and the CERN Medical Service (TIS-ME). Information concerning their toxicity or other hazards as well as the necessary individual and collective protection measures will be provided by these two services. Users must be in possession of a material safety data sheet (MSDS) for each chemical used. These can be obtained by one of several means : the manufacturer of the chemical (legally obliged to supply an MSDS for each chemical delivered) ; CERN's Chemistry Service of the General Safety Group of TIS ; for chemicals and gases available in the CERN Stores the MSDS has been made available via EDH either in pdf format or else via a link to the supplier's web site. Training courses in chemical safety are available for registration via HR-TD. CERN Medical Service : TIS-ME :73186 or service.medical@cern.ch Chemistry Service : TIS-GS-GC : 78546

  4. CFD modeling of reactive pollutant dispersion in simplified urban configurations with different chemical mechanisms

    Science.gov (United States)

    Sanchez, Beatriz; Santiago, Jose-Luis; Martilli, Alberto; Palacios, Magdalena; Kirchner, Frank

    2016-09-01

    An accurate understanding of urban air quality requires considering a coupled behavior between the dispersion of reactive pollutants and atmospheric dynamics. Currently, urban air pollution is mostly dominated by traffic emission, where nitrogen oxides (NOx) and volatile organic compounds (VOCs) are the primary emitted pollutants. However, modeling reactive pollutants with a large set of chemical reactions, using a computational fluid dynamic (CFD) model, requires a large amount of computational (CPU) time. In this sense, the selection of the chemical reactions needed in different atmospheric conditions becomes essential in finding the best compromise between CPU time and accuracy. The purpose of this work is to assess the differences in NO and NO2 concentrations by considering three chemical approaches: (a) passive tracers (non-reactive), (b) the NOx-O3 photostationary state and (c) a reduced complex chemical mechanism based on 23 species and 25 reactions. The appraisal of the effects of chemical reactions focuses on studying the NO and NO2 dispersion in comparison with the tracer behavior within the street. In turn, the effect of including VOC reactions is also analyzed taking into account several VOC / NOx ratios of traffic emission. Given that the NO and NO2 dispersion can also be affected by atmospheric conditions, such as wind flow or the background concentration from season-dependent pollutants, in this work the influence of wind speeds and background O3 concentrations are studied. The results show that the presence of ozone in the street plays an important role in NO and NO2 concentrations. Therefore, greater differences linked to the chemical approach used are found with higher O3 concentrations and faster wind speeds. This bears relation to the vertical flux as a function of ambient wind speed since it increases the pollutant exchange between the street and the overlying air. This detailed study allows one to ascertain under which atmospheric conditions

  5. Internet Use of Polish by Polish Melburnians: Implications for Maintenance and Teaching

    Science.gov (United States)

    Fitzgerald, Michael; Debski, Robert

    2006-01-01

    The Internet has become an important communication medium and it is having a significant impact on language use. The present study takes a "snapshot" of how the Polish language is currently used with modern communications technologies by Polish-Australians living in Melbourne. Through a questionnaire, it surveys which communications…

  6. Growth mechanisms of zinc oxide and zinc sulfide films by mist chemical vapor deposition

    Science.gov (United States)

    Uno, Kazuyuki; Yamasaki, Yuichiro; Tanaka, Ichiro

    2017-01-01

    The growth mechanisms of zinc oxide and zinc sulfide films by mist chemical vapor deposition (mist-CVD) were experimentally investigated from the viewpoint of mist behaviors and chemical reactions. The proper growth model, either vaporization or the Leidenfrost model, was studied by supplying two kinds of mists with different kinds of sources, such as H2 16O and H2 18O for ZnO growth and ZnCl2 and thiourea for ZnS growth. Moreover, the origin of the oxygen atoms of ZnO was investigated using a quantitative analysis. The role of chloro complex of zinc in the growth of ZnS from aqueous solutions was also examined by systematic studies.

  7. Thermo-chemical, mechanical and resin flow integrated analysis in pultrusion

    Science.gov (United States)

    Carlone, Pierpaolo; Rubino, Felice; Palazzo, Gaetano S.

    2016-10-01

    The present work discusses some numerical outcomes provided by an integrated analysis of impregnation, thermo-chemical and stress/strain aspects in a conventional pultrusion process. The impregnation models describes resin flow and pressure distribution in the initial portion of the die, solving a non-homogeneous non-isothermal/reactive multiphase problem, using a finite volume scheme. The thermochemical model describes the heat transfer and degree of cure evolution of the processing resin. Finally, the stress/strain model computes the part distortion and in process stresses due to thermal, chemical, mechanical strains. An applicative case study is presented, simulating the impregnation step of the pultrusion process of a fiberglass-epoxy resin composite rod.

  8. Structural, Mechanical and Optical Properties of Plasma-chemical Si-C-N Films

    Directory of Open Access Journals (Sweden)

    A.O. Kozak

    2014-11-01

    Full Text Available An influence of the substrate temperature in the range of 40-400 °C on the properties of the Si-C-N films deposited by plasma enhanced chemical vapor deposition (PECVD technique using hexamethyldisilazane is analyzed. Study of the structure, chemical bonding, surface morphology, mechanical properties and energy gap of the obtained films was carried out using X-ray diffraction, infrared spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy, optical measurements and nanoindentation. It was established that all the films were X-ray amorphous and had low surface roughness. Intensive hydrogen effusion from the films takes place, when substrate temperature increases up to 400 °C, which promotes a decrease of roughness and an increase in hardness and Young modules more than twice.

  9. Research on the chemical mechanism in the polyacrylate latex modified cement system

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Min [The Key Laboratory of Space Applied Physics and Chemistry, Ministry of Education and Shaanxi Key Laboratory of Macromolecular Science and Technology, School of Science, Northwestern Polytechnical University, Xi' an 710072 (China); Wang, Rumin, E-mail: wangmin19@mail.nwpu.edu.cn [The Key Laboratory of Space Applied Physics and Chemistry, Ministry of Education and Shaanxi Key Laboratory of Macromolecular Science and Technology, School of Science, Northwestern Polytechnical University, Xi' an 710072 (China); Zheng, Shuirong [The Key Laboratory of Space Applied Physics and Chemistry, Ministry of Education and Shaanxi Key Laboratory of Macromolecular Science and Technology, School of Science, Northwestern Polytechnical University, Xi' an 710072 (China); Northwestern Polytechnical University–East China University of Science and Technology Combined Research Institute of New High Speed Railway Materials (China); Farhan, Shameel; Yao, Hao; Jiang, Hao [The Key Laboratory of Space Applied Physics and Chemistry, Ministry of Education and Shaanxi Key Laboratory of Macromolecular Science and Technology, School of Science, Northwestern Polytechnical University, Xi' an 710072 (China)

    2015-10-15

    In this paper, the chemical mechanism in the polyacrylate latex modified cement system was investigated by Fourier transform infrared spectra (FT-IR), X-ray photoelectron spectroscopy (XPS), gel permeation chromatography (GPC) and compact pH meter. All results have shown that the chemical reactions in the polyacrylate modified system can be divided into three stages. The hydration reactions of cement can produce large amounts of Ca(OH){sub 2} (calcium hydroxide) and lead the whole system to be alkali-rich and exothermic at the first stage. Subsequently, this environment can do great contributions to the hydrolysis of ester groups in the polyacrylate chains, resulting in the formation of carboxyl groups at the second stage. At the third stage, the final crosslinked network structure of the product was obtained by the reaction between the carboxyl groups in the polyacrylate latex chains and Ca(OH){sub 2}.

  10. Evaluation of the effect of polishing on flexural strength of feldspathic porcelain and its comparison with autoglazing and over glazing

    Directory of Open Access Journals (Sweden)

    Jalali H.

    2005-06-01

    Full Text Available Statement of Problem: Ceramic restorations are popular because they can provide the most natural replacement for teeth. However, the brittleness of ceramics is a primary disadvantage. There are various methods for strengthening ceramics such as metal framework, ceramic cores, and surface strengthening mechanisms through glazing, work hardening and ion exchange. Purpose: The purpose of this study was to evaluate the effect of polish on flexural strength of feldspathic porcelain and to compare it with overglaze and autoglaze. Materials and Methods: In this experimental study, one brand of feldspathic porcelain (colorlogic, Ceramco was used and forty bars (25×6×3 mm were prepared according to ISO 6872 and ADA No. 69. The specimens were randomly divided into four groups: overglazed, auto glazed, fine polish and coarse polish (clinic polish. Flexural strength of each specimen was determined by three point bending test (Universal Testing Machine, Zwick 1494, Germany. Collected data was analyzed by ANOVA and post-hoc test with P<0.05 as the limit of significance. Results: A significant difference was observed among the studied groups (P<0.0001. According to post-hoc test, flexural strength in overglaze and fine polish group were significantly stronger than clinic polish and autoglaze group (P<0.001. Although the mean value for overglazed group was higher than fine polish group, this was not statistically significant (P=0.9. Also no statistical difference was seen between autoglazed and coarse polish group (P=0.2. Conclusion: Based on the findings of this study, flexural strength achieved by fine polish (used in this study can compete with overglazing the feldespathic porcelains. It also can be concluded that a final finishing procedure that involves fine polishing may be preferred to simple staining followed by self-glazing.

  11. Enhancement of the mechanical properties of directly spun CNT fibers by chemical treatment.

    Science.gov (United States)

    Boncel, Slawomir; Sundaram, Rajyashree M; Windle, Alan H; Koziol, Krzysztof K K

    2011-12-27

    Translating the remarkable mechanical properties of individual carbon nanotubes to macroscopic assemblies presents a unique challenge in maximizing the potential of these remarkable entities for new materials. Infinitely long individual nanotubes would represent the ideal molecular building blocks; however, in the case of length-limited nanotubes, typically in the range of micro- and millimeters, an alternative strategy could be based on the improvement of the mechanical coherency between bundles assembling the macroscopic materials, like fibers or films. Here, we present a method to enhance the mechanical performance of fibers continuously spun from a CVD reactor, by a postproduction processing methodology utilizing a chemical agent aided by UV irradiation. The treatment results in an increase of 100% in specific strength and 300% in toughness of the fibers with strength values rocketing to as high as 3.5 GPa SG(-1). An attempt has been made to explore the nature of the chemical modifications introduced in the fiber and the consequential effects on its properties.

  12. Smoking characteristics of Polish immigrants in Dublin.

    LENUS (Irish Health Repository)

    Kabir, Zubair

    2008-01-01

    BACKGROUND: This study examined two main hypotheses: a) Polish immigrants\\' smoking estimates are greater than their Irish counterparts (b) Polish immigrants purchasing cigarettes from Poland smoke "heavier" (>\\/= 20 cigarettes a day) when compared to those purchasing cigarettes from Ireland. The study also set out to identify significant predictors of \\'current\\' smoking (some days and everyday) among the Polish immigrants. METHODS: Dublin residents of Polish origin (n = 1,545) completed a previously validated Polish questionnaire in response to an advertisement in a local Polish lifestyle magazine over 5 weekends (July-August, 2007). The Office of Tobacco Control telephone-based monthly survey data were analyzed for the Irish population in Dublin for the same period (n = 484). RESULTS: Age-sex adjusted smoking estimates were: 47.6% (95% Confidence Interval [CI]: 47.3%; 48.0%) among the Poles and 27.8% (95% CI: 27.2%; 28.4%) among the general Irish population (p < 0.001). Of the 57% of smokers (n = 345\\/606) who purchased cigarettes solely from Poland and the 33% (n = 198\\/606) who purchased only from Ireland, 42.6% (n = 147\\/345) and 41.4% (n = 82\\/198) were "heavy" smokers, respectively (p = 0.79). Employment (Odds Ratio [OR]: 2.89; 95% CI: 1.25-6.69), lower education (OR: 3.76; 95%CI: 2.46-5.74), and a longer stay in Ireland (>24 months) were significant predictors of current smoking among the Poles. An objective validation of the self-reported smoking history of a randomly selected sub-sample immigrant group, using expired carbon monoxide (CO) measurements, showed a highly significant correlation coefficient (r = 0.64) of expired CO levels with the reported number of cigarettes consumed (p < 0.0001). CONCLUSION: Polish immigrants\\' smoking estimates are higher than their Irish counterparts, and particularly if employed, with only primary-level education, and are overseas >2 years.

  13. Polish parliament liberalizes abortion law.

    Science.gov (United States)

    1996-11-22

    On October 24, the Sejm (Poland's lower house of parliament) voted 228 to 195 (with 16 abstentions) to amend Poland's March 1993 ban on abortions. The amendment legalizes abortion until the 12th week of pregnancy for women who face financial hardship or difficult personal circumstances. Client counseling by a doctor who will not perform the abortion and a 3-day wait are required. Abortions will be permitted in licensed private clinics, as well as in public hospitals. Anyone performing an illegal abortion can receive 2 years' imprisonment. The government will subsidize contraceptive pills, and a sex education curriculum will be developed for schools. Abortion had been legal and widely available under communist rule; however, a Catholic-aligned government limited abortion to cases where a woman's life or health was endangered, where the pregnancy resulted from rape or incest, or where the fetus had a severe anomaly. The Catholic Church opposed the new measure, and the Senat (Poland's upper house), on October 3, had voted 40 to 52 (with 2 abstentions) against the amendment. Although the Sejm had previously voted 208 to 61 (with 15 abstentions) in favor of the amendment, 120 of those opposed to the measure, primarily members of the Polish Peasants Party (part of Poland's ruling coalition), had walked out in protest just before an August tally. The Democratic Left Alliance, the other coalition partner, supports the amendment. The most recent vote in the Sejm overturns the Senat veto; however, before the law can go into effect in 1997, it must be signed by President Aleksandr Kwasniewski (a supporter) after a review by Poland's conservative constitutional tribunal.

  14. Scientific Basis for a Coupled Thermal-Hydrological-Mechanical-Chemical-Biological Experimental Facility at DUSEL Homestake

    Science.gov (United States)

    Sonnenthal, E. L.; Elsworth, D.; Lowell, R. P.; Maher, K.; Mailloux, B. J.; Uzunlar, N.; Freifeld, B. M.; Keimowitz, A. R.; Wang, J. S.

    2009-12-01

    Most natural and engineered earth system processes involve strong coupling of thermal, mechanical, chemical, and sometimes biological processes in rocks that are heterogeneous at a wide range of spatial scales. One of the most pervasive processes in the Earth’s crust is that of fluids (primarily water, but also CO2, hydrocarbons, volcanic gases, etc.) flowing through fractured heated rock under stress. A preliminary design is being formulated for a large-scale subsurface experimental facility to investigate coupled Thermal-Hydrological-Mechanical-Chemical-Biological (THMCB) processes in fractured rock at depth. The experiment would be part of the proposed Deep Underground Science and Engineering Laboratory (DUSEL) in the Homestake Mine, South Dakota. Fundamental geochemical, isotopic, microbiological, laboratory THMC experiments, and numerical modeling will be used to guide the experimental design and evaluation of the time and spatial scales of the coupled THMCB processes. Although we sometimes analyze rocks and fluids for physical and chemical properties, it is difficult to create quantitative numerical models based on fundamental physics and chemistry that can capture the dynamic changes that have occurred or may yet take place. Initial conditions and history are only known roughly at best, and the boundary conditions have likely varied over time as well. Processes such as multicomponent chemical and thermal diffusion, multiphase flow, advection, and thermal expansion/contraction, are taking place simultaneously in rocks that are structurally and chemically complex—heterogeneous assemblages of mineral grains, pores, and fractures—and visually opaque. The only way to fully understand such processes is to carry out well-controlled experiments at a range of scales (grain/pore-scale to decimeter-scale) that can be interrogated and modeled. The THMCB experimental facility is also intended to be a unique laboratory for testing hypotheses regarding effects of

  15. Cellular ceramics made from porcelain tile polishing wastes: influence of sintering time; Ceramicas cellulares obtidas a partir de residuo de polimento de porcelanato: influencia do tempo de sinterizacao

    Energy Technology Data Exchange (ETDEWEB)

    Guimaraes, A.F.; Zanelatto, C.C.; Uggioni, E. [Universidade do Extremo Sul Catarinense (UNESC), Criciuma, SC (Brazil). Dept. de Engenharia de Materiais; Bernardin, A.M., E-mail: amb@unesc.ne [Servico Nacional de Aprendizagem Industrial, Tijucas, SC (Brazil). Tecnologia em Ceramica

    2009-07-01

    This paper deals with the physical, microstructural and mechanical characterization of cellular ceramics made from porcelain polishing wastes, which were expanded by the bubble formation technique during the sintering process. The microstructure, linear expansion, bulk density (mercury immersion) and mechanical behavior (compressive strength) were determined to characterize the glass foam obtained. Moreover, the porcellaneous residue was characterized by chemical and phase analyses, particle size (laser diffraction) and thermal behavior. As a result, the higher the soaking time during heat treatment at 1200 deg C the lower the density obtained for the cellular ceramic due to CO{sub 2} expansion, and lower the mechanical strength of the samples. The microstructure shows spherical cells and completely closed pores, resulting in a cheap way to obtain low density material with adequate mechanical strength, avoiding the disposal of wastes from the ceramic industry. (author)

  16. Virtual Metrology applied in Run-to-Run Control for a Chemical Mechanical Planarization process

    Science.gov (United States)

    Jebri, M. A.; El Adel, E. M.; Graton, G.; Ouladsine, M.; Pinaton, J.

    2017-01-01

    This paper deals with missing data in semiconductor manufacturing derived from a measurement sampling strategies. The idea is to construct a virtual metrology module to estimate non measured variables using a new modified Just-In-Time Learning approach (JITL). The aim of this paper is to integrate estimated data into product control loop. In collaboration with our industrial partner STMicroelectronics Rousset, the accuracy of the proposed method is illustrated by using industrial data-sets derived from Chemical Mechanical Planarization (CMP) process that enables us to compare results obtained with the classical and the modified version of JITL approach. Then, the contribution of the estimated data is shown in product quality improvement.

  17. Different sensing mechanisms in single wire and mat carbon nanotubes chemical sensors

    CERN Document Server

    Neumann, P L; Dobrik, G; Kertész, K; Horváth, E; Lukács, I E; Biró, L P; Horváth, Z E

    2014-01-01

    Chemical sensing properties of single wire and mat form sensor structures fabricated from the same carbon nanotube (CNT) materials have been compared. Sensing properties of CNT sensors were evaluated upon electrical response in the presence of five vapours as acetone, acetic acid, ethanol, toluene, and water. Diverse behaviour of single wire CNT sensors was found, while the mat structures showed similar response for all the applied vapours. This indicates that the sensing mechanism of random CNT networks cannot be interpreted as a simple summation of the constituting individual CNT effects, but is associated to another robust phenomenon, localized presumably at CNT-CNT junctions, must be supposed.

  18. Chemical and mechanical interactions of interstitials in V-5%Cr-5%Ti

    Energy Technology Data Exchange (ETDEWEB)

    DeVan, J.H.; DiStefano, J.R.; Hendricks, J.W. [Oak Ridge National Lab., TN (United States)] [and others

    1995-04-01

    A vanadium alloy structure with liquid lithium is the favored concept for an advanced breeding blanket for ITER. The objective of this task is to determine the kinetics of reactions of vanadium alloys with hydrogen and oxygen as a function of alloy composition and TMT. Gas-metal reaction studies of V-5Cr-5Ti were conducted to determine the kinetics of reactions with H{sub 2} and O{sub 2}, respectively, at 450-500{degree}C. Reaction rates were determined through wieght change measurements and chemical analyses, and effects on mechanical properties were evaluated by room temperature tensile tests.

  19. Synthesis, mechanical, thermal and chemical properties of polyurethanes based on cardanol

    Indian Academy of Sciences (India)

    C V Mythili; A Malar Retna; S Gopalakrishnan

    2004-06-01

    Cardanol, an excellent monomer for polymer production, has been isolated from CNSL and allowed to react with formaldehyde in a particular mole ratio in the presence of glutaric acid catalyst to give high-ortho novolac resin. Such characterized polyol has been condensed with diphenylmethane diisocyanate to produce rigid polyurethane. A commercially available polyol, polypropylene glycol-2000 (PPG-2000), has also been condensed with diphenylmethane diisocyanate and polyol to produce tough polyurethane. These polyurethanes were characterized with respect to their resistance to chemical reagents and mechanical properties such as tensile strength, percentage elongation, tear strength and hardness. Differential thermal analysis (DTA) and thermo-gravimetric analysis (TGA) were undertaken for thermal characterization.

  20. Combined effects of crystallography, heat treatment and surface polishing on blistering in tungsten exposed to high-flux deuterium plasma

    Science.gov (United States)

    Zayachuk, Y.; Tanyeli, I.; Van Boxel, S.; Bystrov, K.; Morgan, T. W.; Roberts, S. G.

    2016-08-01

    For tungsten exposed to low-energy hydrogen-plasmas, it has been thought that grains with surface normal are most susceptible to blistering while those with surface normal are virtually impervious to it. Here, we report results showing that non-uniformity of blister distribution depends on the state of the surface due to polishing. In electrochemically polished material blisters appear on the grains with all orientations, while in mechanically polished material blister-free areas associated with particular orientations emerge. On the other hand, blistering is shown to have a strong dependence on the level of deformation within particular grains in partially recrystallized material.

  1. Polishing methods for metallic and ceramic transmission electron microscopy specimens: Revision 1

    Energy Technology Data Exchange (ETDEWEB)

    Kestel, B.J.

    1986-03-01

    In recent years, the increasing sophistication of transmission electron microscope (TEM) studies of materials has necessitated more exacting methods of specimen preparation. The present report describes improved equipment and techniques for electropolishing and chemically polishing a wide variety of specimens. Many of the specimens used in developing or improving the techniques to be described were irradiated with heavy ions such as nickel or vanadium to study radiation damage. The high cost of these specimens increased the need for reproducible methods of initial preparation postirradiation processing, and final thinning for TEM examination. A technique was also developed to salvage specimens that had previously been thinned but were unusable for various reasons. Jet polishing is, in general, the method of choice for surface polishing, sectioning, and thinning. The older beaker electropolishing method is included in this report because it is inexpensive and simple, and gives some insight into how the more recent methods were developed.

  2. Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001).

    Science.gov (United States)

    Deng, Hui; Endo, Katsuyoshi; Yamamura, Kazuya

    2015-03-10

    The surface atomic step-terrace structure of 4H-SiC greatly affects its performance in power device applications. On the basis of the crystal structure of 4H-SiC, we propose the generation mechanism of the a-b-a*-b* type, a-b type and a-a type step-terrace structures. We demonstrate that the step-terrace structure of SiC can be controlled by adjusting the balance between chemical modification and physical removal in CeO2 slurry polishing. When chemical modification plays the main role in the polishing of SiC, the a-b-a*-b* type step-terrace structure can be generated. When the roles of physical removal and chemical modification have similar importance, the a-b-a*-b* type step-terrace structure changes to the a-b type. When physical removal is dominant, the uniform a-a type step-terrace structure can be generated.

  3. Chemical bath deposition of CdS thin films: An approach to the chemical mechanism through study of the film microstructure

    Energy Technology Data Exchange (ETDEWEB)

    Dona, J.M.; Herrero, J. [CIEMAT, Madrid (Spain). Inst. de Energias Renovables

    1997-11-01

    Many papers have been published lately on chemical bath deposition of CdS (CBD-CdS) thin films and related materials due to the promising results obtained using CBD-CdS for the fabrication of thin-film solar cells. In spite of this little of the research proposes a realistic chemical mechanism for the deposition process based on the determination of kinetic parameters. In this paper the authors present an exhaustive study of the CBD-CdS kinetic from which they propose a new chemical mechanism which agrees with the kinetic parameters determined supported by heterogeneous catalysis concepts. Simultaneously, the dependence of the deposited film structure on the kinetic variables is studied and the results obtained corroborate the proposed mechanism. These studies have allowed the authors to establish a standard set of conditions for the fabrication of homogeneous and continuous very thin CdS films.

  4. Professional Training of Economists at Polish Universities

    Directory of Open Access Journals (Sweden)

    Ogienko Olena

    2016-09-01

    Full Text Available Polish experience in professional training of economists at university has been generalized. Structural, content and procedural peculiarities of the training have been defined. It has been proved that key factors for reforming economic education in Poland are globalization, internationalization, integration, technologization and informatization. It has been found out that forming of economic competency is based on the competency-based and personality-based approaches that allow to direct the educational process at a student as an active subject of learning, to create conditions for his/her creative potential development, to educate a competent specialist possessing all the competencies needed in professional activity. The influence of Polish universities’ integration into European system of student exchange on the quality of future specialists’ training has been revealed. Flexibility and variety of syllabi and curricula of economists’ professional training at Polish universities have been emphasized. Among perspective teaching methods we have singled out situational modeling as it allows to create situations at most approximated to those in professional activity, is oriented at co-creation and teamwork. It has been found out that the peculiarities of economists’ professional training at Polish universities are flexibility, diversification, standardization, personalization and adaptation to modern labour market. It has been proved that the result of economists’ professional training at Polish universities is a highly qualified specialist able to adapt to dramatic changes in economy and society.

  5. Chemical vapor deposition of carbon nanotubes: a review on growth mechanism and mass production.

    Science.gov (United States)

    Kumar, Mukul; Ando, Yoshinori

    2010-06-01

    This review article deals with the growth mechanism and mass production of carbon nanotubes (CNTs) by chemical vapor deposition (CVD). Different aspects of CNT synthesis and growth mechanism are reviewed in the light of latest progresses and understandings in the field. Materials aspects such as the roles of hydrocarbon, catalyst and catalyst support are discussed. Many new catalysts and new carbon sources are described. Growth-control aspects such as the effects of temperature, vapor pressure and catalyst concentration on CNT diameter distribution and single- or multi-wall formation are explained. Latest reports of metal-catalyst-free CNT growth are considered. The mass-production aspect is discussed from the perspective of a sustainable CNT technology. Existing problems and challenges of the process are addressed with future directions.

  6. Studying chemical reactions in biological systems with MBN Explorer: implementation of molecular mechanics with dynamical topology

    CERN Document Server

    Sushko, Gennady B; Verkhovtsev, Alexey V; Volkov, Sergey N; Solov'yov, Andrey V

    2015-01-01

    The concept of molecular mechanics force field has nowadays been widely accepted for studying various processes in biomolecular systems. In this paper we suggest a modification for the standard CHARMM force field, that permits simulations of systems with dynamically changing molecular topologies. The implementation of the modified force field was carried out in the popular program MBN Explorer, and, to support the development, in this paper we provide several case studies where dynamical topology is necessary. In particular, it is shown, that the modified molecular mechanics force field can be applied for studying processes where rupture of chemical bonds plays an essential role, e.g., in irradiation or collision induced damage, transformation and fragmentation processes involving biomolecular systems.

  7. Computational organic chemistry: bridging theory and experiment in establishing the mechanisms of chemical reactions.

    Science.gov (United States)

    Cheng, Gui-Juan; Zhang, Xinhao; Chung, Lung Wa; Xu, Liping; Wu, Yun-Dong

    2015-02-11

    Understanding the mechanisms of chemical reactions, especially catalysis, has been an important and active area of computational organic chemistry, and close collaborations between experimentalists and theorists represent a growing trend. This Perspective provides examples of such productive collaborations. The understanding of various reaction mechanisms and the insight gained from these studies are emphasized. The applications of various experimental techniques in elucidation of reaction details as well as the development of various computational techniques to meet the demand of emerging synthetic methods, e.g., C-H activation, organocatalysis, and single electron transfer, are presented along with some conventional developments of mechanistic aspects. Examples of applications are selected to demonstrate the advantages and limitations of these techniques. Some challenges in the mechanistic studies and predictions of reactions are also analyzed.

  8. Changes in mechanical and chemical wood properties by electron beam irradiation

    Energy Technology Data Exchange (ETDEWEB)

    Schnabel, Thomas, E-mail: thomas.schnabel@fh-salzburg.ac.at [Salzburg University of Applied Sciences, Department of Forest Products Technology and Wood Constructions, Marktstraße 136a, 5431 Kuchl (Austria); Huber, Hermann [Salzburg University of Applied Sciences, Department of Forest Products Technology and Wood Constructions, Marktstraße 136a, 5431 Kuchl (Austria); Grünewald, Tilman A. [BOKU University of Natural Resources and Life Sciences, Institute of Physics and Materials Science, Peter Jordan Straße 82, 1190 Vienna (Austria); Petutschnigg, Alexander [Salzburg University of Applied Sciences, Department of Forest Products Technology and Wood Constructions, Marktstraße 136a, 5431 Kuchl (Austria); BOKU University of Natural Resources and Life Sciences, Konrad Lorenzstraße 24, 3430 Tulln (Austria)

    2015-03-30

    Highlights: • Changes in wood due to electron beam irradiations (EBI) were evaluated. • Wood components undergo different altering mechanisms due to the irradiation. • Chemical reactions in wood lead to better surface hardness of low irradiated wood. - Abstract: This study deals with the influence of various electron beam irradiation (EBI) dosages on the Brinell hardness of Norway spruce. The results of the hardness measurements and the FT-IR spectroscopic analysis show different effects of the EBI at dosages of 25, 50, 100 and 200 kGy. It was assumed that the lignin and carbohydrates undergo different altering mechanisms due to the EBI treatment. New cleavage products and condensation reactions of lignin and carbohydrates lead to better surface hardness of low irradiated wood samples. These results provide a useful basis for further investigations on the changes in wood chemistry and material properties due to electron beam irradiations.

  9. Results of a polishing study for SCHOTT XLD glasses

    Science.gov (United States)

    Jedamzik, Ralf; Yadwad, Harshwadhan; Dietrich, Volker

    2015-09-01

    Extremely low dispersion glasses (e.g. SCHOTT XLD glasses) play an essential role in the color correction of optical systems. Together with short flint glasses (KZFS Types) they can be used for apochromatic color correction in the visible spectrum or even for broadband color correction in combination with lanthanum crown glasses (LAK Types). Unfortunately the chemical composition of those glasses leads to a high coefficient of thermal expansion, low hardness and low resistance against chemical attacks. As a consequence these glasses tend to be difficult in processing. Therefore the glass engineer's task is to improve processing characteristics while keeping their special optical properties. N-FK58 XLD is an example of a new generation of XLD glasses from SCHOTT with improved workability. In 2014 a processing study has been conducted to optimize the polishing of XLD glasses. This presentation will show the results of this study for N-FK58 XLD and the application to other fluorophosphates glasses.

  10. Mechanical and chemical behavior of intergranular fluids in nonhydrostatically stressed rocks at low temperature

    Institute of Scientific and Technical Information of China (English)

    刘亮明; 彭省临

    2001-01-01

    Intergranular fluids within the nonhydrostatically stressed solids are a sort of important fluids in the crust. Research on the mechanical and chemical behavior of the intergranular fluids in nonhydrostatically stressed rocks at low temperature is a key for understanding deformation and syntectonic geochemical processes in mid to shallow crust. Theoretically, it is suggested that the fluid film sandwiched between solid grains is one of the main states of intergranular fluids in the nonhydrostatically stressed solids. Their superthin thickness makes the fluid films have the mechanical and chemical behavior very different from the common fluids. Because of hydration force, double-layer repulsive force or osmotic pressure due to double-layer, the fluid films can transmit nonhydrostatic stress. The solid minerals-intergranular fluids interaction and mass transfer by intergranular fluids is stress-related, because the stress in solid minerals can enhance the free energy of solid matter on the interfaces. The thermodynamic and kinetic equations for the simple case of stress induced processes are derived.

  11. Statistical analysis of crystallization database links protein physico-chemical features with crystallization mechanisms.

    Directory of Open Access Journals (Sweden)

    Diana Fusco

    Full Text Available X-ray crystallography is the predominant method for obtaining atomic-scale information about biological macromolecules. Despite the success of the technique, obtaining well diffracting crystals still critically limits going from protein to structure. In practice, the crystallization process proceeds through knowledge-informed empiricism. Better physico-chemical understanding remains elusive because of the large number of variables involved, hence little guidance is available to systematically identify solution conditions that promote crystallization. To help determine relationships between macromolecular properties and their crystallization propensity, we have trained statistical models on samples for 182 proteins supplied by the Northeast Structural Genomics consortium. Gaussian processes, which capture trends beyond the reach of linear statistical models, distinguish between two main physico-chemical mechanisms driving crystallization. One is characterized by low levels of side chain entropy and has been extensively reported in the literature. The other identifies specific electrostatic interactions not previously described in the crystallization context. Because evidence for two distinct mechanisms can be gleaned both from crystal contacts and from solution conditions leading to successful crystallization, the model offers future avenues for optimizing crystallization screens based on partial structural information. The availability of crystallization data coupled with structural outcomes analyzed through state-of-the-art statistical models may thus guide macromolecular crystallization toward a more rational basis.

  12. Multidimensional fully-coupled thermal/chemical/mechanical response of reactive materials

    Energy Technology Data Exchange (ETDEWEB)

    Hobbs, M.L.; Baer, M.R.

    1995-11-01

    A summary of multidimensional modeling is presented which describes coupled thermals chemical and mechanical response of reactive and nonreactive materials. This modeling addresses cookoff of energetic material (EM) prior to the onset of ignition. Cookoff, lasting from seconds to days, sensitizes the EM whereupon combustion of confined, degraded material determines the level of violence. Such processes are dynamic, occurring over time scales of millisecond to microsecond, and thus more amenable for shock physics analysis. This work provides preignition state estimates such as the amount of decomposition, morphological changes, and quasistatic stress states for subsequent dynamic analysis. To demonstrate a fully-coupled thermal/chemical/quasistatic mechanical capability, several example simulations have been performed: (1) the one-dimensional time-to-explosion experiments, (2) the Naval Air Weapon Center`s (NAWC) small scale cookoff bomb, (3) a small hot cell experiment and (4) a rigid, highly porous, closed-cell polyurethane foam. Predictions compared adequately to available data. Deficiencies in the model and future directions are discussed.

  13. A Comparative Study of Fibrillated Fibers from Different Mechanical and Chemical Pulps

    Directory of Open Access Journals (Sweden)

    Panu Lahtinen

    2014-02-01

    Full Text Available Fibrillation of chemical and mechanical pulps with different lignin contents was studied. The pulps were ion exchanged into their sodium form prior to fibrillation and fibrillated with an increasing level of energy using high-shear friction grinding. The fibrillated samples were characterized for their chemical composition, morphology, rheological properties, and water retention capacity. All pulps had a distinct tendency to form fibrillated material under high shear and compression. The lignin-containing kraft pulps fibrillated easily, and the resulting material can be utilized in applications where high viscosity, water retention capacity, and reinforcement are desired. Fibrillation of mechanical pulps resulted in more heterogeneous samples, which included fiber fragments, branched fibrillar structures, and flake-like particles. This material showed relatively low viscosity and water retention capacity when compared to the samples made from kraft pulps. Chemi-thermomechanical pulp (CTMP, when used as the raw material, yielded a more homogeneous organic filler-like material than did thermomechanical pulp (TMP.

  14. SYNERGISTIC EFFECTS BETWEEN BIRCH CHEMICAL MECHANICAL PULPS AND ASPEN BLEACHED KRAFT PULP

    Institute of Scientific and Technical Information of China (English)

    Eric C. Xu; Yajun Zhou

    2004-01-01

    In this investigation, two different grades of birch chemical mechanical (P-RC APMP) pulps and aspen market bleached kraft pulp were compared by low consistency refining of the pulps separately and in different combinations. In addition, the separately refined pulps were also combined to compare with the pulps from the co-refined pulp blend. The results showed that in both cases there were synergistic effects between the two types of pulps: adding the birch P-RC APMP pulp to the aspen kraft pulp improved pulp properties, and the resultant pulp blends had a higher fiber bonding strength (tensile and tensile energy absorption) than the sum of weighted contributions from the individual components. Understanding this synergistic effect between chemical mechanical (P-RC APMP) and kraft pulps can help to improve their applications and performances in various papermaking processes.The results also showed that introducing, at least up to certain percentage of, the birch P-RC APMP pulp into the aspen bleached kraft pulp not only improves optical and bulk properties, but also maintains or improves tensile strength, even though the P-RC APMP pulp used has lower tensile than the kraft pulp.

  15. SYNERGISTIC EFFECTS BETWEEN BIRCH CHEMICAL MECHANICAL PULPS AND ASPEN BLEACHED KRAFT PULP

    Institute of Scientific and Technical Information of China (English)

    EricC.Xu; YajunZhou

    2004-01-01

    In this investigation, two different grades of birch chemical mechanical (P-RC APMP) pulps and aspen market bleached kraft pulp were compared by low consistency refining of the pulps separately and in different combinations. In addition, the separately refined pulps were also combined to compare with the pulps from the co-refined pulp blend. The results showed that in both cases there were synergistic effects between the two types of pulps: adding the birch P-RC APMP pulp to the aspen kraft pulp improved pulp properties, and the resultant pulp blends had a higher fiber bonding strength (tensile and tensile energy absorption) than the sum of weighted contributions from the individual components. Understanding this synergistic effect between chemical mechanical (P-RC APMP) and kraft pulps can help to improve their applications and performances in various papermaking processes. The results also showed that introducing, at least up to certain percentage of, the birch P-RC APMP pulp into the aspen bleached kraft pulp not only improves optical and bulk properties, but also maintains or improves tensile strength, even though the P-RC APMP pulp used has lower tensile than the kraft pulp.

  16. Modelling the Tox21 10 K chemical profiles for in vivo toxicity prediction and mechanism characterization.

    Science.gov (United States)

    Huang, Ruili; Xia, Menghang; Sakamuru, Srilatha; Zhao, Jinghua; Shahane, Sampada A; Attene-Ramos, Matias; Zhao, Tongan; Austin, Christopher P; Simeonov, Anton

    2016-01-26

    Target-specific, mechanism-oriented in vitro assays post a promising alternative to traditional animal toxicology studies. Here we report the first comprehensive analysis of the Tox21 effort, a large-scale in vitro toxicity screening of chemicals. We test ∼ 10,000 chemicals in triplicates at 15 concentrations against a panel of nuclear receptor and stress response pathway assays, producing more than 50 million data points. Compound clustering by structure similarity and activity profile similarity across the assays reveals structure-activity relationships that are useful for the generation of mechanistic hypotheses. We apply structural information and activity data to build predictive models for 72 in vivo toxicity end points using a cluster-based approach. Models based on in vitro assay data perform better in predicting human toxicity end points than animal toxicity, while a combination of structural and activity data results in better models than using structure or activity data alone. Our results suggest that in vitro activity profiles can be applied as signatures of compound mechanism of toxicity and used in prioritization for more in-depth toxicological testing.

  17. Time Evolution of Thermo-Mechanically and Chemically Coupled Magma Chambers

    Science.gov (United States)

    Ozimek, C.; Karlstrom, L.; Erickson, B. A.

    2015-12-01

    Complexity in the volcanic eruption cycle reflects time variation both of magma inputs to the crustal plumbing system and of crustal melt storage zones (magma chambers). These data include timing and volumes of eruptions, as well as erupted compositions. Thus models must take into account the coupled nature of physical attributes. Here we combine a thermo-mechanical model for magma chamber growth and pressurization with a chemical model for evolving chamber compositions, in the limit of rapid mixing, to study controls on eruption cycles and compositions through time. We solve for the mechanical evolution of a 1D magma chamber containing melt, crystals and bubbles, in a thermally evolving and viscoelastic crust. This pressure and temperature evolution constrains the input values of a chemical box model (Lee et al., 2013) that accounts for recharge, eruption, assimilation and fractional crystallization (REAFC) within the chamber. We plan to study the influence of melt supply, input composition, and chamber depth eruptive fluxes and compositions. Ultimately we will explore multiple chambers coupled by elastic-walled dikes. We expect that this framework will facilitate self-consistent inversion of long-term eruptive histories in terms of magma transport physics. Lee, C.-T. A., Lee, T.-C., Wu, C.-T., 2013. Modeling the compositional evolution of recharging, evacuating, and fractionating (REFC) magma chambers: Implications for differentiationof arc magmas. Geochemica Cosmochimica Acta, http://dx.doi.org/10.1016/j.gca.2013.08.009.

  18. Mechanically strengthened new Hagi porcelain developed by controlling the chemical environment of iron

    Science.gov (United States)

    Kubuki, Shiro; Iwanuma, Jun; Akiyama, Kazuhiko; Mikuni, Akira; Nishida, Tetsuaki

    2012-05-01

    In order to enhance the mechanical strength of Hagi Porcelain (Hagiyaki), one of the oldest and famous potteries in Japan, new preparation condition was examined. Tempered Hagi porcelain, denominated as ` Hagi Porcelain B', was prepared with the Porcelain clay originating from Daido district, Yamaguchi Prefecture, Japan. Structural change of ` Hagi Porcelain B' was investigated by means of 57Fe-Mössbauer spectroscopy, X-ray diffractometry (XRD) and three-point bending test. Mechanical strength of the ` original Hagi Porcelain B' was estimated to be 43.1 MPa by means of the three-point bending test, while much larger value of 104.5 MPa could be achieved when tempered by a chemical modification. Mössbauer spectrum of the ` original Hagi porcelain B' was composed of a paramagnetic doublet and a magnetic sextet due to Fe(III) of γ-Fe2O3(maghemite), while only one paramagnetic doublet due to to octahedral Fe(II)O6 was observed for the ` tempered Hagi Porcelain B' with isomer shift and quadrupole splitting values of 1.13 and 2.15 mm s-1, respectively. It is considered that the absence of magnetic phase causes an increase of the mechanical strength because the maghemite phase has a defect spinel structure. These results indicate that mechanical strength of the ` Hagi porcelain B' could be enhanced by controlling the sintering condition.

  19. Developing free morphological data for Polish

    Directory of Open Access Journals (Sweden)

    Adam Radziszewski

    2015-11-01

    Full Text Available Developing free morphological data for Polish A limiting factor in construction of Natural Language Processing (NLP systems is often the availability of morphological resources. This indeed happens for Polish: the freely available corpus with manual morpho-syntactic annotation (part of the IPI PAN Corpus is not coupled with any free morphological analyser. There exists a very large morphological dictionary of Polish available under a free licence – Morfologik. Unfortunately, its tagset differs significantly from the tagset of the corpus and, what is more, its morphological description lacks desired rigour. We amend this situation by performing a massive conversion of the dictionary into the tagset compliant with the corpus. The conversion results in a free dictionary containing entries for almost 3.5 million different word forms. In this article we report on our methodology, discuss some morphological and syntactic issues related to both tagsets and present the characteristics of the resulting dictionary.

  20. Preliminary study of disc hydrodynamic polishing.

    Science.gov (United States)

    Li, Yan; Lin, Bin; Zhang, XiaoFeng; Liu, PengFei

    2016-10-01

    In this paper, a developed polishing method based on elastic emission machining and Jules Verne-a variation on fluid jet polishing-is presented. This method is named disc hydrodynamic polishing (DHDP). A computational fluid dynamics (CFD)-based model that consists of a CFD model and an erosion model is introduced to predict the surface roughness obtained by DHDP. The performance of DHDP is studied by experiments. The slurry used in the experiments comprises 95% deionized water and 5% cerium oxide particles. Fused-silica glass is chosen as the workpiece. After the experiments, an ultrasmooth surface without cracks is obtained. The simulation results principally coincide with the experimental results. The experimental results show that the actual roughness is slightly less than the prediction and smaller particles are more favorable for obtaining a better surface roughness.

  1. Priorities in the Polish health care system.

    Science.gov (United States)

    Nieszporska, Sylwia

    2017-01-01

    Since 1999, Polish health policy has changed, the quality of services has increased, and also the level of financing, mainly from public benefits. Despite constant growth of indexes reflecting the health status of Polish society, such as life expectancy, quality of life, or decreasing index of deaths at birth, just as in the majority of European countries, in Poland the society is growing older, which implies the necessity to reorganize the system. In this paper, the author has described the most important factors that determine the operation of the health system in Poland, as well as presents the ways it was restructured over the last few years, taking into consideration the structural, legislative, financial, organizational, and quantitative aspects. Also, the latest trends in Polish health policy, which take into account new goals of the system, have been presented within.

  2. Effects of Mechanical and Chemical Pretreatments of Zirconia or Fiber Posts on Resin Cement Bonding.

    Directory of Open Access Journals (Sweden)

    Rui Li

    Full Text Available The bonding strength between resin cement and posts is important for post and core restorations. An important method of improving the bonding strength is the use of various surface pretreatments of the post. In this study, the surfaces of zirconia (fiber posts were treated by mechanical and/or chemical methods such as sandblasting and silanization. The bonding strength between the zirconia (fiber post and the resin cement was measured by a push-out method after thermocycling based on the adhesion to Panavia F 2.0 resin cement. The zirconia and fiber posts exhibited different bonding strengths after sandblasting and/or silanization because of the different strengths and chemical structures. The zirconia post showed a high bonding strength of up to 17.1 MPa after a combined treatment of sandblasting and silanization because of the rough surface and covalent bonds at the interface. This effect was also enhanced by using 1,2-bis(trimethoxysilylethane for the formation of a flexible layer at the interface. In contrast, a high bonding strength of 13.9 MPa was obtained for the fiber post treated by silane agents because the sandblasting treatment resulted in damage to the fiber post, as observed by scanning electron microscopy. The results indicated that the improvement in the bonding strength between the post and the resin cement could be controlled by different chemical and/or mechanical treatments. Enhanced bonding strength depended on covalent bonding and the surface roughness. A zirconia post with high bonding strength could potentially be used for the restoration of teeth in the future.

  3. Reduced chemical reaction mechanisms: experimental and HCCI modelling investigations of autoignition processes of iso-octane in internal combustion engines

    OpenAIRE

    Machrafi, Hatim; Lombaert, K.; Cavadias, S; Guibert, P.; Amouroux, J

    2005-01-01

    A semi-reduced (70 species, 210 reactions) and a skeletal (27 species, 29 reactions) chemical reaction mechanism for iso-octane are constructed from a semi-detailed iso-octane mechanism (84 species, 412 reactions) of the Chalmers University of Technology in Sweden. The construction of the reduced mechanisms is performed by using reduction methods such as the quasi-steady-state assumption and the partial equilibrium assumption. The obtained reduced iso-octane mechanisms show, at the mentioned ...

  4. Stress "deafness" in a Language with Fixed Word Stress: An ERP Study on Polish.

    Science.gov (United States)

    Domahs, Ulrike; Knaus, Johannes; Orzechowska, Paula; Wiese, Richard

    2012-01-01

    The aim of the present contribution was to examine the factors influencing the prosodic processing in a language with predictable word stress. For Polish, a language with fixed penultimate stress but several well-defined exceptions, difficulties in the processing and representation of prosodic information have been reported (e.g., Peperkamp and Dupoux, 2002). The present study utilized event-related potentials (ERPs) to investigate the factors influencing prosodic processing in Polish. These factors are (i) the predictability of stress and (ii) the prosodic structure in terms of metrical feet. Polish native speakers were presented with correctly and incorrectly stressed Polish words and instructed to judge the correctness of the perceived stress patterns. For some stress violations, an early negativity was found which was interpreted as a reflection of an error-detection mechanism. In addition, exceptional stress patterns (=antepenultimate stress) and post-lexical (=initial) stress evoked a task-related positivity effect (P300) whose amplitude and latency is correlated with the degree of anomaly and deviation from an expectation. In contrast, violations involving the default (=penultimate stress) did not produce such an effect. This asymmetrical result is interpreted to reflect that Polish native speakers are less sensitive to the default pattern than to the exceptional or post-lexical patterns. Behavioral results are orthogonal to the electrophysiological results showing that Polish speakers had difficulties to reject any kind of stress violation. Thus, on a meta-linguistic level Polish speakers appeared to be stress-"deaf" for any kind of stress manipulation, whereas the neural reactions differentiate between the default and lexicalized patterns.

  5. An experimental study on the ultra-precision polishing of quartz crystal using MR fluids and micro abrasives

    Science.gov (United States)

    Kim, D. W.; Lee, J. W.; Cho, M. W.; Choi, S. B.

    2009-02-01

    This paper presents ultra-precision MR polishing results of quartz crystal, which has been widely used in many applications, such as piezo-electric transducer, surface acoustic wave (SAW) filters and SAW resonators, etc. It is known that smooth surface with sub-nanometer roughness is needed for higher-frequency application. The MR fluids, used for the polishing, consist of DI water based carbonyl iron (CI), nonmagnetic polishing micro abrasives, and required amount of stabilizers. In the process, mixed fluids were supplied into the gap between a rotating wheel (with electromagnetic field) and the workpiece. Then, the micro abrasives contained in the fluids perform material removal action from the workpiece. Such material removal mechanism in the MR polishing is considered as a process governed by the Bingham flow in the contact zone. In this study, material removal characteristics and generated surface roughness of the quartz crystal specimens using the MR polishing process were investigated through a series of experiments. The surface roughness variations of the polished specimens were investigated by changing imposed polishing conditions, such as wheel speed, magnetic field intensity. As a result, very fine surface roughness of Ra=0.770nm was obtained.

  6. POLISH-RUSSIAN COOPERATION OF POMORSKIE PROVINCE

    Directory of Open Access Journals (Sweden)

    Christina GOMULKA

    2015-01-01

    Full Text Available Polish-Russian Cooperation of Pomorskie Province commenced in 1999 and was based on the intergovernmental agreements. The new agreement, executed between the authorities of the Pomeranian Province and Kaliningrad Oblast in 2002, provided for cooperation in many areas. The contacts between the partners were dominated by economic cooperation. The Polish–Russian cooperation stopped with Polish accession to the Schengen zone. Cooperation resumed when in 2011 and agreement on small cross-border traffic was signed and then ratified in 2012. 

  7. Analysis of the isolated SecA DEAD motor suggests a mechanism for chemical-mechanical coupling.

    Science.gov (United States)

    Nithianantham, Stanley; Shilton, Brian H

    2008-11-07

    The preprotein cross-linking domain and C-terminal domains of Escherichia coli SecA were removed to create a minimal DEAD motor, SecA-DM. SecA-DM hydrolyzes ATP and has the same affinity for ADP as full-length SecA. The crystal structure of SecA-DM in complex with ADP was solved and shows the DEAD motor in a closed conformation. Comparison with the structure of the E. coli DEAD motor in an open conformation (Protein Data Bank ID 2FSI) indicates main-chain conformational changes in two critical sequences corresponding to Motif III and Motif V of the DEAD helicase family. The structures that the Motif III and Motif V sequences adopt in the DEAD motor open conformation are incompatible with the closed conformation. Therefore, when the DEAD motor makes the transition from open to closed, Motif III and Motif V are forced to change their conformations, which likely functions to regulate passage through the transition state for ATP hydrolysis. The transition state for ATP hydrolysis for the SecA DEAD motor was modeled based on the conformation of the Vasa helicase in complex with adenylyl imidodiphosphate and RNA (Protein Data Bank ID 2DB3). A mechanism for chemical-mechanical coupling emerges, where passage through the transition state for ATP hydrolysis is hindered by the conformational changes required in Motif III and Motif V, and may be promoted by binding interactions with the preprotein substrate and/or other translocase domains and subunits.

  8. Influence of chemical heat treatment on the mechanical properties of paper knife-edge die

    Directory of Open Access Journals (Sweden)

    K. Dybowski

    2009-12-01

    Full Text Available Purpose: In this article mechanical properties together with wear mechanism of paper knife-edge die made of A 681 steel with TiN, TiCN and DLC coating were analyzed. A Paper knife-edge die using in stamping machine, serves a map of complicated graphical projects. However wear resistance is strongly dependent on chemical composition of a paper mainly on the TiO2 content.Design/methodology/approach: In order to optimize the wear resistance of analyzed paper knife-edge die, influence of HS6-5-2 and A 681 substrate with Duplex treatment (vacuum nitriding/ TiN, TiCN and DLC antiwear coatings deposition were compared. Morphology and mechanical properties (hardness, adhesion were measured.Findings: The present results show that the duplex treatment (nitriding/TiN is a very promising technology for protection of paper knife-edge dies due to the uniform, dense structure with a high adhesion to the HS6-5-2 substrate. Hybrid layer fabricated by the gas nitriding and vacuum arc deposition presented improved mechanical properties.Research limitations/implications: In further examinations to compare the results obtained for each layer it should be taken into consideration to manufacture the gradient DLC layers onto nitrided high-speed cutting steel. For full analysis of worked out technology additional examinations concerning investigation of friction coefficient and wear resistance and corrosion features of deposited layers should be conducted.Originality/value: Our experiments provide in this case the evidence of increased mechanical properties of HS6-5-2 steel together with Duplex treatment (TiN coating instead of A 681 substrate with TiN or TiCN coating.

  9. Structure and mechanical properties of pyrolytic carbon produced by fluidized bed chemical vapor deposition

    Energy Technology Data Exchange (ETDEWEB)

    Lopez-Honorato, E.; Meadows, P.J. [Manchester Materials Science Centre, School of Materials, University of Manchester, Grosvenor Street, Manchester M1 7HS (United Kingdom); Xiao, P. [Manchester Materials Science Centre, School of Materials, University of Manchester, Grosvenor Street, Manchester M1 7HS (United Kingdom)], E-mail: Ping.Xiao@manchester.ac.uk; Marsh, G.; Abram, T.J. [Nexia Solutions Ltd., Springfields PR4 0XJ (United Kingdom)

    2008-11-15

    Pyrolytic carbon was deposited on spherical particles using a multi-spout fluidized bed chemical vapor deposition reactor to fabricate TRISO fuel for the High Temperature Reactor (HTR). Modern techniques such as Raman spectroscopy and nanoindentation supported by porosimetry, scanning electron microscopy and transmission electron microscopy were employed to analyze the particle coatings directly. Raman spectroscopy and nanoindentation were given special attention due to their capacity to provide information on the internal structure of pyrolytic carbon and its mechanical properties without the necessity of complex sample preparation. The results obtained were used to study the relationship deposition conditions-microstructure-mechanical properties in more detail. Increasing the deposition temperature reduced the density and Young's modulus as porosity and in-plane disorder of carbon domains increased. There was also a change from a laminar microstructure of PyC to that containing more spherical particles. It appeared that anisotropy, domain size and level of graphitization (examined by Raman and TEM) had a strong influence on the mechanical properties. Clear differences were observed between acetylene and the acetylene/propylene mixture as precursor gases.

  10. Reaction mechanisms of aqueous monoethanolamine with carbon dioxide: a combined quantum chemical and molecular dynamics study.

    Science.gov (United States)

    Hwang, Gyeong S; Stowe, Haley M; Paek, Eunsu; Manogaran, Dhivya

    2015-01-14

    Aqueous monoethanolamine (MEA) has been extensively studied as a solvent for CO2 capture, yet the underlying reaction mechanisms are still not fully understood. Combined ab initio and classical molecular dynamics simulations were performed to revisit and identify key elementary reactions and intermediates in 25-30 wt% aqueous MEA with CO2, by explicitly taking into account the structural and dynamic effects. Using static quantum chemical calculations, we also analyzed in more detail the fundamental interactions involved in the MEA-CO2 reaction. We find that both the CO2 capture by MEA and solvent regeneration follow a zwitterion-mediated two-step mechanism; from the zwitterionic intermediate, the relative probability between deprotonation (carbamate formation) and CO2 removal (MEA regeneration) tends to be determined largely by the interaction between the zwitterion and neighboring H2O molecules. In addition, our calculations clearly demonstrate that proton transfer in the MEA-CO2-H2O solution primarily occurs through H-bonded water bridges, and thus the availability and arrangement of H2O molecules also directly impacts the protonation and/or deprotonation of MEA and its derivatives. This improved understanding should contribute to developing more comprehensive kinetic models for use in modeling and optimizing the CO2 capture process. Moreover, this work highlights the importance of a detailed atomic-level description of the solution structure and dynamics in order to better understand molecular mechanisms underlying the reaction of CO2 with aqueous amines.

  11. Contemporary Contrastive Studies of Polish, Bulgarian and Russian Neologisms versus Language Corpora

    Directory of Open Access Journals (Sweden)

    Joanna Satoła-Staśkowiak

    2015-06-01

    Full Text Available Contemporary Contrastive Studies of Polish, Bulgarian and Russian Neologisms versus Language Corpora In the field of Slavonic linguistics contrastive studies of neologisms occupy little place, the newest words are insufficiently described and classified. The aim of this article is to draw attention to the need for contrastive description of the newest lexis and checking exclusively one of many possibilities of obtaining Polish, Bulgarian and Russian neologisms. Language corpora, as this possibility is in question, are not the only source from which the author obtains her research material, yet a growing interest in corpora has inspired her to also use this method. The author wants to show the reader to what degree language corpora can help in building the thesaurus of Polish, Bulgarian and Russian neologisms. Making an attempt to confront a collection of neologisms of contemporary Polish, Bulgarian and Russian language, the author points out the need to standardize the description (identical for each of the analysed languages, which she intends to propose in another publications on neologisms in Polish, Bulgarian and Russian language. The application of contrastive method to three different but related languages from the Slavonic group will help, in her opinion, to discover more mechanisms of new words coming into existence and examine the newest derivative processes and their productivity.

  12. An Experimental Analysis of Price Formation on the Polish Power Exchange

    Directory of Open Access Journals (Sweden)

    Drabik Ewa

    2015-12-01

    Full Text Available The Polish energy market gained its competitive character in late 1990s. At that time in majority of European countries a new law was enacted (in Poland – in 1987, which enabled the creation of internal energy markets. The Polish Power Exchange has been functioning since the end of 1999. However, from the very onset it has constituted a vital component of under grounding liberalization of electricity market. Since it was created the Polish Power Exchange has served as a market mechanism for setting objective energy market price. Support and control of the Polish Financial Supervision Authority guarantee the security of concluded transactions. The spot energy market was created as the first one and has functioned according to the rule of the double auction. The model of Sadrieh will be used for the description of the auction rules applied to the spot energy trade on the Polish Power Exchange. Furthermore, an algorithm on the basis of which it is possible to forecast transaction prices is presented. The effectiveness of this algorithm will be compared with other traditional methods of forecasting transaction prices.

  13. Orthogonal experiment and analysis of power spectral density on process parameters of pitch tool polishing

    Science.gov (United States)

    Meng, Kai; Wan, Yongjian; Wu, Fan; Shen, Lijun; Wu, Hsing-Yu

    2017-02-01

    Mid to high spatial frequency error (MSFR and HSFR) should be strictly controlled in modern optical systems. Pitch tool polishing (PTP) is an effective ultra-smoothing surface manufacturing method to control MSFR and HSFR. But it is difficult to control because it is affected by a lot of factors. The present paper describes the pitch tool polishing study based on eighteen well-planned orthogonal experiments (OA18 matrix). Five main process factors (abrasive particle size, slurry concentration, pad rotation speed, acidity and polishing time) in pitch tool polishing process were investigated. In this study, power spectral density (PSD) based on Fourier analysis of surface topography data obtained by white light interferometer was used as the results of orthogonal experiments instead of material removal rate and surface roughness. A normalization method of PSD was proposed as the range analysis rule. Three parts of spatial frequency bandwidth were selected and discussed. Acidity is the most important factor in part 1 and slurry concentration is the most significant one in part 2; while acidity is the least influenced one in part 3. The result in each part was explained by two-step material removal mechanism. At last, suggestions in low and high spatial frequency are given for pitch tool polishing.

  14. 21 CFR 872.6030 - Oral cavity abrasive polishing agent.

    Science.gov (United States)

    2010-04-01

    ... 21 Food and Drugs 8 2010-04-01 2010-04-01 false Oral cavity abrasive polishing agent. 872.6030... (CONTINUED) MEDICAL DEVICES DENTAL DEVICES Miscellaneous Devices § 872.6030 Oral cavity abrasive polishing agent. (a) Identification. An oral cavity abrasive polishing agent is a device in paste or powder...

  15. Study of the Contact Force in Free-form Surfaces Compliant EDM Polishing by Robot

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    With an elastic negative pole being driven by ultra so nic vibration and being moved along the surface of work-piece compliantly by ro bot, a new kind of effective EDM, the compliant EDM, cuts the electrically condu ctive materials away and polishes work-piece of free-form surface. The study o f the contact force between the end of polishing tool and the surface of work-p iece is the key for the compliant EDM to study its cutting mechanism and to make better use of it. This paper makes a model for the cont...

  16. The electrochemical polishing behavior of the Inconel 718 alloy in perchloric-acetic mixed acids

    Energy Technology Data Exchange (ETDEWEB)

    Huang, C.A. [Department of Mechanical Engineering, Chang Gung University, Taoyuan, Taiwan (China)], E-mail: gfehu@mail.cgu.edu.tw; Chen, Y.C.; Chang, J.H. [Department of Mechanical Engineering, Chang Gung University, Taoyuan, Taiwan (China)

    2008-02-15

    The electropolishing behavior of the Inconel 718 alloy was studied by using rotating disc electrode (RDE) in the HClO{sub 4}-CH{sub 3}COOH mixed acids with different HClO{sub 4}-concentrations. After electropolishing, surface morphologies of RDE specimens were examined with surface profiler, atomic force microscope and scanning electron microscope. According to the surface morphologies observed, three types of anodic dissolution behavior can be characterized in relation to the HClO{sub 4}-content in mixed acids; namely, leveling without brightening of the surface in the mixed acids with 10 and 20 vol% HClO{sub 4}, leveling and brightening of the surface in the mixed acids with 30 and 40 vol% HClO{sub 4}, and a matt and gray surface in the mixed acids with 50 vol% or more HClO{sub 4}. Anodic dissolution in the first and second dissolution types follows a mass-transfer controlled mechanism, in which a linear relationship between the reciprocal of limiting-current density and the reciprocal of square root of rotating speed of RDE specimen can be detected. Owing to precipitation of salt film on the polished surface of the Inconel 718 material, saturated dissolved metallic ions could be the chemical species for the mass-controlled mechanism. The salt film, in addition, could enhance the corrosion resistance of the Inconel 718 alloy.

  17. Magnetic force improvement and parameter optimization for magnetic abrasive polishing of AZ31 magnesium alloy

    Institute of Scientific and Technical Information of China (English)

    2008-01-01

    The magnetic force acting on workpieee to be machined plays a significantly important role in magnetic abrasive polishing process.But in a case of polishing nonferrous materials,the strength of magnetic force is very low and it leads lower polishing efficiency.The magnesium alloy that has superior mechanical properties for industrial application such as a lightweight and high specific strength is one of the most famous nonferrous materials.An improving strategy of the magnetic force for me AZ31 magnesium alloy installed with a permanent magnet was proposed and experimental verification Was carded out.For the proposed strategy,the effect of process parameters on the surface roughness of the AZ31 magnesium alloy Was evaluated by a design of experimental method.

  18. Polish Complementary Schools in Iceland and England

    Science.gov (United States)

    Zielinska, Malgorzata; Kowzan, Piotr; Ragnarsdóttir, Hanna

    2014-01-01

    Since 2004, the opening of labour markets has spurred a considerable number of Poles to emigrate e.g. to Iceland and England. Families with school age children have had the challenge of adapting to foreign environments and school systems. Polish complementary schools have played an important, albeit ambivalent, role in this process. Through focus…

  19. Technological Advances of Robot Assisted Polishing

    DEFF Research Database (Denmark)

    Lazarev, Ruslan; Top, Søren; Grønbæk, Jens;

    The efficient polishing of surfaces is very important in mould and die industry. Fine abrasive processes are widely used in industry for the first steps for the production of tools of high quality in terms of finishing accuracy, form and surface integrity. While manufacturing of most components...

  20. Temporal Expressions in Polish Corpus KPWr

    Directory of Open Access Journals (Sweden)

    Jan Kocoń

    2015-12-01

    Full Text Available Temporal Expressions in Polish Corpus KPWr This article presents the result of the recent research in the interpretation of Polish expressions that refer to time. These expressions are the source of information when something happens, how often something occurs or how long something lasts. Temporal information, which can be extracted from text automatically, plays significant role in many information extraction systems, such as question answering, discourse analysis, event recognition and many more. We prepared PLIMEX — a broad description of Polish temporal expressions with annotation guidelines, based on the state-of-the-art solutions for English, mainly TimeML specification. We also adapted the solution to capture the local semantics of temporal expressions, called LTIMEX. Temporal description also supports further event identification and extends event description model, focusing at anchoring events in time, ordering events and reasoning about the persistence of events. We prepared the specification, which is designed to address these issues and we annotated all documents in Polish Corpus of Wroclaw University of Technology (KPWr using our annotation guidelines.

  1. Towards an event annotated corpus of Polish

    Directory of Open Access Journals (Sweden)

    Michał Marcińczuk

    2015-12-01

    Full Text Available Towards an event annotated corpus of Polish The paper presents a typology of events built on the basis of TimeML specification adapted to Polish language. Some changes were introduced to the definition of the event categories and a motivation for event categorization was formulated. The event annotation task is presented on two levels – ontology level (language independent and text mentions (language dependant. The various types of event mentions in Polish text are discussed. A procedure for annotation of event mentions in Polish texts is presented and evaluated. In the evaluation a randomly selected set of documents from the Corpus of Wrocław University of Technology (called KPWr was annotated by two linguists and the annotator agreement was calculated. The evaluation was done in two iterations. After the first evaluation we revised and improved the annotation procedure. The second evaluation showed a significant improvement of the agreement between annotators. The current work was focused on annotation and categorisation of event mentions in text. The future work will be focused on description of event with a set of attributes, arguments and relations.

  2. Polishing Difficult-To-Reach Cavities

    Science.gov (United States)

    Malinzak, R. Michael; Booth, Gary N.

    1990-01-01

    Springy abrasive tool used to finish surfaces of narrow cavities made by electrical-discharge machining. Robot arm moves vibrator around perimeters of cavities, polishing walls of cavities as it does so. Tool needed because such cavities inaccessible or at least difficult to reach with most surface-finishing tools.

  3. Fluid jet polishing of optical surfaces

    NARCIS (Netherlands)

    Fähnle, O.W.; Brug, H. van; Frankena, H.J.

    1998-01-01

    We present a new finishing process that is capable of locally shaping and polishing optical surfaces of complex shapes. A fluid jet system is used to guide a premixed slurry at pressures less than 6 bars to the optical surface. We used a slurry comprising water and 10% #800 SiC abrasives (21.8 μm to

  4. Neurocognitive Dimensions of Lexical Complexity in Polish

    Science.gov (United States)

    Szlachta, Zanna; Bozic, Mirjana; Jelowicka, Aleksandra; Marslen-Wilson, William D.

    2012-01-01

    Neuroimaging studies of English suggest that speech comprehension engages two interdependent systems: a bilateral fronto-temporal network responsible for general perceptual and cognitive processing, and a specialised left-lateralised network supporting specifically linguistic processing. Using fMRI we test this hypothesis in Polish, a Slavic…

  5. Knowledge Mobilisation in the Polish Education System

    Science.gov (United States)

    Fazlagic, Jan; Erkol, Arif

    2015-01-01

    Poland has made substantial progress in improving the quality of its education system in recent years. This paper aims to describe the situation of the Polish education system from a knowledge management perspective and, to some extent, through innovation policies in education. The many challenges, this paper argues, can be tackled only through…

  6. Professional Training of Economists at Polish Universities

    Science.gov (United States)

    Ogienko, Olena

    2016-01-01

    Polish experience in professional training of economists at university has been generalized. Structural, content and procedural peculiarities of the training have been defined. It has been proved that key factors for reforming economic education in Poland are globalization, internationalization, integration, technologization and informatization.…

  7. Sexual Health of Polish Athletes with Disabilities

    Directory of Open Access Journals (Sweden)

    Ryszard Plinta

    2015-06-01

    Full Text Available The purpose of this study was to determine sexual functioning of Polish athletes with disabilities (including paralympians. The study encompassed 218 people with physical disabilities, aged between 18 and 45 (149 men and 69 women. The entire research population was divided into three groups: Polish paralympians (n = 45, athletes with disabilities (n = 126 and non-athletes with disabilities (n = 47. The quality of sexual life of Polish paralympians was measured by using the Polish version of Female Sexual Function Index and International Index of Erectile Function. Clinically significant erectile dysfunctions were most often diagnosed in non-athletes (83.33% with 50% result of severe erectile dysfunctions, followed by athletes and paralympians with comparable results of 56.98% and 54.17% respectively (p = 0.00388. Statistically significant clinical sexual dysfunctions concerned lubrication, orgasm as well as pain domains, and prevailed among female non-athletes (68.42%, 68.42% and 57.89%. Practising sports at the highest level has a favourable effect on the sexuality of men and women with physical disabilities. Men with physical disabilities manifest more sexual disorders than women, an aspect which should be considered by health-care professionals working with people with disabilities.

  8. Wastewater polishing by a channelized macrophyte-dominated wetland and anaerobic digestion of the harvested phytomass

    Science.gov (United States)

    : Constructed wetlands (CW) offer a mechanism to meet regulatory standards for wastewater treatment while minimizing energy inputs. To optimize CW wastewater polishing activities and investigate integration of CW with energy production from anaerobic digestion we constructed a pair of three-tier ch...

  9. Band gap engineering in polymers through chemical doping and applied mechanical strain

    Science.gov (United States)

    Lanzillo, Nicholas A.; Breneman, Curt M.

    2016-08-01

    We report simulations based on density functional theory and many-body perturbation theory exploring the band gaps of common crystalline polymers including polyethylene, polypropylene and polystyrene. Our reported band gaps of 8.6 eV for single-chain polyethylene and 9.1 eV for bulk crystalline polyethylene are in excellent agreement with experiment. The effects of chemical doping along the polymer backbone and side-groups are explored, and the use mechanical strain as a means to modify the band gaps of these polymers over a range of several eV while leaving the dielectric constant unchanged is discussed. This work highlights some of the opportunities available to engineer the electronic properties of polymers with wide-reaching implications for polymeric dielectric materials used for capacitive energy storage.

  10. Kinematic analysis of in situ measurement during chemical mechanical planarization process

    Energy Technology Data Exchange (ETDEWEB)

    Li, Hongkai; Wang, Tongqing; Zhao, Qian; Meng, Yonggang; Lu, Xinchun, E-mail: xclu@tsinghua.edu.cn [State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China)

    2015-10-15

    Chemical mechanical planarization (CMP) is the most widely used planarization technique in semiconductor manufacturing presently. With the aid of in situ measurement technology, CMP tools can achieve good performance and stable productivity. However, the in situ measurement has remained unexplored from a kinematic standpoint. The available related resources for the kinematic analysis are very limited due to the complexity and technical secret. In this paper, a comprehensive kinematic analysis of in situ measurement is provided, including the analysis model, the measurement trajectory, and the measurement time of each zone of wafer surface during the practical CMP process. In addition, a lot of numerical calculations are performed to study the influences of main parameters on the measurement trajectory and the measurement velocity variation of the probe during the measurement process. All the efforts are expected to improve the in situ measurement system and promote the advancement in CMP control system.

  11. Characteristics and Mechanisms in Ion-Conducting Polymer Films as Chemical Sensors

    Energy Technology Data Exchange (ETDEWEB)

    HUGHES,ROBERT C.; YELTON,WILLIAM G.; PFEIFER,KENT B.; PATEL,SANJAY V.

    2000-07-12

    Solid Polymer Electrolytes (SPE) are widely used in batteries and fuel cells because of the high ionic conductivity that can be achieved at room temperature. The ions are usually Li or protons, although other ions can be shown to conduct in these polymer films. There has been very little published work on SPE films used as chemical sensors. The authors have found that thin films of polymers like polyethylene oxide (PEO) are very sensitive to low concentrations of volatile organic compounds (VOCs) such as common solvents. Evidence of a new sensing mechanism involving the percolation of ions through narrow channels of amorphous polymer is presented. They present impedance spectroscopy of PEO films in the frequency range 0.0001 Hz to 1 MHz for different concentrations of VOCs and relative humidity. They find that the measurement frequency is important for distinguishing ionic conductivity from the double layer capacitance and the parasitic capacitance.

  12. Chemical-Free Cotton Defoliation by; Mechanical, Flame and Laser Girdling

    Directory of Open Access Journals (Sweden)

    Mathew G. Pelletier

    2017-01-01

    Full Text Available A novel new way to achieve chemical-free defoliation of cotton is discussed. The research found that by severing the phloem tissue on the main stalk, via a girdling operation, the operation stimulated the cotton plant to alter its growth into an early senescence pathway that resulted in the plant shedding its leaves and opening up all its bolls, leaving the plant in the perfect state for machine harvesting. Even with follow-up rains, zero regrowth occurred in the treated plants, unlike the untreated control plots where significant regrowth did occur. This report compares the results of greenhouse and field trials where the girdling operation was performed by hand, flame, mechanical and via a CO2 laser to achieve phloem tissue severance. Design parameters for a prototype laser girdling system are also provided. Results suggest that for deficit irrigated cotton, girdling can provide an alternative means to defoliate cotton.

  13. Hybrid Cleaning Technology for Enhanced Post-Cu/Low-Dielectric Constant Chemical Mechanical Planarization Cleaning Performance

    Science.gov (United States)

    Ramachandran, Manivannan; Cho, Byoung-Jun; Kwon, Tae-Young; Park, Jin-Goo

    2013-05-01

    During chemical mechanical planarization (CMP), a copper/low-k surface is often contaminated by abrasive particles, organic materials and other additives. These contaminants need to be removed in the subsequent cleaning process with minimum material loss. In this study, a dilute amine-based alkaline cleaning solution is used along with physical force in the form of megasonic energy to remove particles and organic contaminants. Tetramethylammonium hydroxide (TMAH) and monoethanolamine (MEA) are used as an organic base and complexing agent, respectively, in the proposed solution. Ethanolamine acts as a corrosion inhibitor in the solution. Organic residue removal was confirmed through contact angle measurements and X-ray photoelectron spectroscopy analysis. Electrochemical studies showed that the proposed solution increases protection against corrosion, and that the hybrid cleaning technology resulted in higher particle removal efficiency from both the copper and low-k surfaces.

  14. Preparation and mechanism of calcium phosphate coatings on chemical modified carbon fibers by biomineralization

    Institute of Scientific and Technical Information of China (English)

    HUANG Su-ping; ZHOU Ke-chao; LI Zhi-you

    2008-01-01

    In order to prepare HA coatings on the carbon fibers, chemical modification and biomineralization processes were applied. The phase components, morphologies, and possible growth mechanism of calcium phosphate were studied by infrared spectroscopy(IR), X-ray diffractometry(XRD) and scanning electron microscopy(SEM). The results show that calcium phosphate coating on carbon fibers can be obtained by biomineralization. But the phase components and morphologies of calcium phosphate coatings are different due to different modification methods. Plate-like CaHPO4-2H2O (DCPD) crystals grow from one site of the active centre by HNO3 treatment. While on the para-aminobenzoic acid treated fibers, the coating is composed of nano-structural HA crystal homogeneously. This is because the -COOH functional groups of para-aminobenzoic acid graft on fibers, with negative charge and arranged structure, accelerating the HA crystal nucleation and crystallization on the carbon fibers.

  15. Kandelia obovata (S., L.) Yong tolerance mechanisms to Cadmium: subcellular distribution, chemical forms and thiol pools.

    Science.gov (United States)

    Weng, Bosen; Xie, Xiangyu; Weiss, Dominik J; Liu, Jingchun; Lu, Haoliang; Yan, Chongling

    2012-11-01

    In order to explore the detoxification mechanisms adopted by mangrove under cadmium (Cd) stress, we investigated the subcellular distribution and chemical forms of Cd, in addition to the change of the thiol pools in Kandelia obovata (S., L.) Yong, which were cultivated in sandy culture medium treated with sequential Cd solution. We found that Cd addition caused a proportional increase of Cd in the organs of K. obovata. The investigation of subcellular distribution verified that most of the Cd was localized in the cell wall, and the lowest was in the membrane. Results showed sodium chloride and acetic acid extractable Cd fractions were dominant. The contents of non-protein thiol compounds, Glutathione and phytochelatins in K. obovata were enhanced by the increasing strength of Cd treatment. Therefore, K. obovata can be defined as Cd tolerant plant, which base on cell wall compartmentalization, as well as protein and organic acids combination.

  16. Insight into the mechanisms of chemical doping of graphene on silicon carbide.

    Science.gov (United States)

    Giannazzo, Filippo

    2016-02-19

    Graphene (Gr) is currently the object of intense research investigations, owing to its rich physics and wide potential for applications. In particular, epitaxial Gr on silicon carbide (SiC) holds great promise for the development of new device concepts based on the vertical current transport at Gr/SiC heterointerface. Precise tailoring of Gr workfunction (WF) represents a key requirement for these device structures. In this context, Günes et al (2015 Nanotechnology 26 445702) recently reported a straightforward approach for WF modulation in epitaxial Gr on silicon carbide by using nitric acid solutions at different dilutions. This paper provides a deep insight on the peculiar mechanisms of chemical doping of epitaxial Gr on 4H-SiC(0001), using several characterization techniques (Raman, UPS, AFM) and density functional theory calculations. The relevance of these findings and their perspective applications in emerging device concepts based on monolithic integration of Gr and SiC will be discussed.

  17. [Mechanism of intermolecular energy transfer and reception of ultralow action by chemical and biological systems].

    Science.gov (United States)

    Gall', L N; Gall', N R

    2009-01-01

    A novel concept of intermolecular energy transfer and reception of the ultralow action in living systems is proposed. The concept is based on the methods of nonlinear mathematical physics used in description of energy movement along molecular chains and on quantum mechanical ideas concerning signal formation in anisotropic media. A concept of a molecular cell as an indivisible structural unit and a constituent of a biological (chemical) system has been put forward and substantiated, which manifests collective features of the unity of molecules, physical fields, and energetically strained bound water media in processes of energy transfer and reception. Both intermolecular energy transfer and amplification of the ultralow action has been shown to be the components of a unified energy process in a living system, and the physical basis of both processes is the unity of molecules and water-field media in a molecular cell.

  18. An Improved Chemical Resistance and Mechanical Durability of Hydrophobic FDTS Coatings

    Science.gov (United States)

    Kobrin, B.; Zhang, T.; Grimes, M. T.; Chong, K.; Wanebo, M.; Chinn, J.; Nowak, R.

    2006-04-01

    Chemical and mechanical stability of FDTS (perfluorodecyltrichlorosilane) hydrophobic coatings was improved by using an oxide adhesion layer followed by an in-situ vapour deposition of the FDTS self-aligned monolayer. The use of silicon oxide base layer improves stability of the FDTS film and degradation of its hydrophobic properties resulting from a continuous immersion in water and other liquids. We ascribe the improved stability of the FDTS films grown on oxide to high density and uniformity of the surface hydroxyl groups required for FDTS attachment and the resulting high quality of the FDTS monolayer. This approach shows film property improvement over traditional substrates such as silicon and aluminium but may also be particularly useful in biochemistry and micro fluidics when films are deposited on substrates with lower density of the surface hydroxyl groups.

  19. Dual Raman-Brillouin Microscope for Chemical and Mechanical Characterization and Imaging.

    Science.gov (United States)

    Traverso, Andrew J; Thompson, Jonathan V; Steelman, Zachary A; Meng, Zhaokai; Scully, Marlan O; Yakovlev, Vladislav V

    2015-08-01

    We present a unique confocal microscope capable of measuring the Raman and Brillouin spectra simultaneously from a single spatial location. Raman and Brillouin scattering offer complementary information about a material's chemical and mechanical structure, respectively, and concurrent monitoring of both of these spectra would set a new standard for material characterization. We achieve this by applying recent innovations in Brillouin spectroscopy that reduce the necessary acquisition times to durations comparable to conventional Raman spectroscopy while attaining a high level of spectral accuracy. To demonstrate the potential of the system, we map the Raman and Brillouin spectra of a molded poly(ethylene glycol) diacrylate (PEGDA) hydrogel sample in cyclohexane to create two-dimensional images with high contrast at microscale resolutions. This powerful tool has the potential for very diverse analytical applications in basic science, industry, and medicine.

  20. Mechanism of waste biomass pyrolysis: Effect of physical and chemical pre-treatments.

    Science.gov (United States)

    Das, Oisik; Sarmah, Ajit K

    2015-12-15

    To impart usability in waste based biomass through thermo-chemical reactions, several physical and chemical pre-treatments were conducted to gain an insight on their mode of action, effect on the chemistry and the change in thermal degradation profiles. Two different waste biomasses (Douglas fir, a softwood and hybrid poplar, a hardwood) were subjected to four different pre-treatments, namely, hot water pre-treatment, torrefaction, acid (sulphuric acid) and salt (ammonium phosphate) doping. Post pre-treatments, the changes in the biomass structure, chemistry, and thermal makeup were studied through electron microscopy, atomic absorption/ultra violet spectroscopy, ion exchange chromatography, and thermogravimetry. The pre-treatments significantly reduced the amounts of inorganic ash, extractives, metals, and hemicellulose from both the biomass samples. Furthermore, hot water and torrefaction pre-treatment caused mechanical disruption in biomass fibres leading to smaller particle sizes. Torrefaction of Douglas fir wood yielded more solid product than hybrid poplar. Finally, the salt pre-treatment increased the activation energies of the biomass samples (especially Douglas fir) to a great extent. Thus, salt pre-treatment was found to bestow thermal stability in the biomass.

  1. Mechanisms Mediating Environmental Chemical-Induced Endocrine Disruption in the Adrenal Gland

    Science.gov (United States)

    Martinez-Arguelles, Daniel B.; Papadopoulos, Vassilios

    2015-01-01

    Humans are continuously exposed to hundreds of man-made chemicals that pollute the environment in addition to multiple therapeutic drug treatments administered throughout life. Some of these chemicals, known as endocrine disruptors (EDs), mimic endogenous signals, thereby altering gene expression, influencing development, and promoting disease. Although EDs are eventually removed from the market or replaced with safer alternatives, new evidence suggests that early-life exposure leaves a fingerprint on the epigenome, which may increase the risk of disease later in life. Epigenetic changes occurring in early life in response to environmental toxicants have been shown to affect behavior, increase cancer risk, and modify the physiology of the cardiovascular system. Thus, exposure to an ED or combination of EDs may represent a first hit to the epigenome. Only limited information is available regarding the effect of ED exposure on adrenal function. The adrenal gland controls the stress response, blood pressure, and electrolyte homeostasis. This endocrine organ therefore has an important role in physiology and is a sensitive target of EDs. We review herein the effect of ED exposure on the adrenal gland with particular focus on in utero exposure to the plasticizer di(2-ethylehyl) phthalate. We discuss the challenges associated with identifying the mechanism mediating the epigenetic origins of disease and availability of biomarkers that may identify individual or population risks. PMID:25788893

  2. Mechanisms mediating environmental chemical-induced endocrine disruption in the adrenal gland

    Directory of Open Access Journals (Sweden)

    Daniel B Martinez-Arguelles

    2015-03-01

    Full Text Available Humans are continuously exposed to hundreds of man-made chemicals that pollute the environment in addition to multiple therapeutic drug treatments administered throughout life. Some of these chemicals, known as endocrine disruptors (EDs, mimic endogenous signals, thereby altering gene expression, influencing development, and promoting disease. Although EDs are eventually removed from the market or replaced with safer alternatives, new evidence suggests that early life exposure leaves a fingerprint on the epigenome, which may increase the risk of disease later in life. Epigenetic changes occurring in early life in response to environmental toxicants have been shown to affect behavior, increase cancer risk, and modify the physiology of the cardiovascular system. Thus, exposure to an ED or combination of EDs may represent a first hit to the epigenome. Only limited information is available regarding the effect of ED exposure on adrenal function. The adrenal gland controls the stress response, blood pressure, and electrolyte homeostasis. This endocrine organ therefore has an important role in physiology and is a sensitive target of EDs. We review herein the effect of ED exposure on the adrenal gland with particular focus on in utero exposure to the plasticizer di(2-ethylehyl phthalate. We discuss the challenges associated with identifying the mechanism mediating the epigenetic origins of disease and availability of biomarkers that may identify individual or population risks.

  3. Effects of thermal treatment on chemical, mechanical and colour traits in Norway spruce wood.

    Science.gov (United States)

    Kačíková, Danica; Kačík, František; Cabalová, Iveta; Durkovič, Jaroslav

    2013-09-01

    In several different branches of the wood industry heat treatment is a growing application as it changes the chemical, mechanical, physical and biological properties of wood. Investigations using wet chemical analyses, Fourier transform infrared spectroscopy, size exclusion chromatography, and CIELab colour system have been conducted to study the changes in Norway spruce wood subjected to temperature up to 270°C over a 30 min time period. The results showed that mass loss (ML), total crystallinity index (TCI) of cellulose, total colour difference (ΔE*), and the content of lignin and extractives increased with the temperature, whereas degree of polymerization (DP) of cellulose, modulus of rupture (MOR), modulus of elasticity (MOE), lightness difference (ΔL*), and the content of holocellulose, cellulose and hemicelluloses all decreased with the thermal treatment. Relationships between temperature and the examined wood traits were all fitted by exponential curves. Power law relationships were found to fit the trends for DP of cellulose with ΔE*, ΔL*, and TCI of cellulose. Also found were power law regressions for the content of hemicelluloses with MOE, MOR, ΔL*, and ML. Temperatures ranging from 20 to 187°C formed a compact cluster, clearly separated from the higher examined temperatures in the multivariate wood trait space.

  4. Mechanism of waste biomass pyrolysis: Effect of physical and chemical pre-treatments

    Energy Technology Data Exchange (ETDEWEB)

    Das, Oisik [Department of Biological Systems Engineering, Washington State University, Pullman 99164-6120, WA (United States); Department of Civil and Environmental Engineering, University of Auckland, Auckland 1142 (New Zealand); Sarmah, Ajit K., E-mail: a.sarmah@auckland.ac.nz [Department of Civil and Environmental Engineering, University of Auckland, Auckland 1142 (New Zealand)

    2015-12-15

    To impart usability in waste based biomass through thermo-chemical reactions, several physical and chemical pre-treatments were conducted to gain an insight on their mode of action, effect on the chemistry and the change in thermal degradation profiles. Two different waste biomasses (Douglas fir, a softwood and hybrid poplar, a hardwood) were subjected to four different pre-treatments, namely, hot water pre-treatment, torrefaction, acid (sulphuric acid) and salt (ammonium phosphate) doping. Post pre-treatments, the changes in the biomass structure, chemistry, and thermal makeup were studied through electron microscopy, atomic absorption/ultra violet spectroscopy, ion exchange chromatography, and thermogravimetry. The pre-treatments significantly reduced the amounts of inorganic ash, extractives, metals, and hemicellulose from both the biomass samples. Furthermore, hot water and torrefaction pre-treatment caused mechanical disruption in biomass fibres leading to smaller particle sizes. Torrefaction of Douglas fir wood yielded more solid product than hybrid poplar. Finally, the salt pre-treatment increased the activation energies of the biomass samples (especially Douglas fir) to a great extent. Thus, salt pre-treatment was found to bestow thermal stability in the biomass. - Highlights: • Pre-treatments reduce ash, extractives, alkalines and hemicellulose from biomass. • Torrefaction of Douglas fir yields more solid product than hybrid poplar. • Salt pretreatment significantly increases the activation energy of biomass. • Acid and salt pretreatment bestows thermal stability in biomass.

  5. Evaluation of the Chemical and Mechanical Properties of Hardening High-Calcium Fly Ash Blended Concrete

    Directory of Open Access Journals (Sweden)

    Wei-Jie Fan

    2015-09-01

    Full Text Available High-calcium fly ash (FH is the combustion residue from electric power plants burning lignite or sub-bituminous coal. As a mineral admixture, FH can be used to produce high-strength concrete and high-performance concrete. The development of chemical and mechanical properties is a crucial factor for appropriately using FH in the concrete industry. To achieve sustainable development in the concrete industry, this paper presents a theoretical model to systematically evaluate the property developments of FH blended concrete. The proposed model analyzes the cement hydration, the reaction of free CaO in FH, and the reaction of phases in FH other than free CaO. The mutual interactions among cement hydration, the reaction of free CaO in FH, and the reaction of other phases in FH are also considered through the calcium hydroxide contents and the capillary water contents. Using the hydration degree of cement, the reaction degree of free CaO in FH, and the reaction degree of other phases in FH, the proposed model evaluates the calcium hydroxide contents, the reaction degree of FH, chemically bound water, porosity, and the compressive strength of hardening concrete with different water to binder ratios and FH replacement ratios. The evaluated results are compared to experimental results, and good consistencies are found.

  6. Preparation of High Impermeable and Crack-resistance Chemical Admixture and Its Mechanism

    Institute of Scientific and Technical Information of China (English)

    2002-01-01

    A kind of high impermeable and crack-resistance chemical admixture (HICRCA) was prepared, which is a compound chemical admixture composed of an expansion ingredient,density ingredient, and organic hydrophobic poreblocking ingredient. The results of the experiments indicate that the addition of HICRCA improves mortar and concrete in the following performances:(1) perfect workability: slump is more than 22cm, the slump after 3h is about 16cm; (2)high impermeability:for the mortar,the pervious height under a water pressure of 1.5MPa is 1.5cm,for the concrete, the pervious height under a water pressure of 5.0MPa is 2.2cm;(3)high crack-resistance:there is a micro-expansion at the age of 90d;(4)high compressivestrength:compared with the controlled concrete,the compressive strengths at the age of 3d and 28d are improved by 66.4% and 62.0%, respectively.At the same time,the effects of different curing condition on mortar and concrete expansive and shrinkage performance were studied.In addition,the impermeable and crack-resistance mechanism was investigated in the present paper.

  7. Molecular Mechanisms of Allosteric Inhibition of Brain Glycogen Phosphorylase by Neurotoxic Dithiocarbamate Chemicals.

    Science.gov (United States)

    Mathieu, Cécile; Bui, Linh-Chi; Petit, Emile; Haddad, Iman; Agbulut, Onnik; Vinh, Joelle; Dupret, Jean-Marie; Rodrigues-Lima, Fernando

    2017-02-03

    Dithiocarbamates (DTCs) are important industrial chemicals used extensively as pesticides and in a variety of therapeutic applications. However, they have also been associated with neurotoxic effects and in particular with the development of Parkinson-like neuropathy. Although different pathways and enzymes (such as ubiquitin ligases or the proteasome) have been identified as potential targets of DTCs in the brain, the molecular mechanisms underlying their neurotoxicity remain poorly understood. There is increasing evidence that alteration of glycogen metabolism in the brain contributes to neurodegenerative processes. Interestingly, recent studies with N,N-diethyldithiocarbamate suggest that brain glycogen phosphorylase (bGP) and glycogen metabolism could be altered by DTCs. Here, we provide molecular and mechanistic evidence that bGP is a target of DTCs. To examine this system, we first tested thiram, a DTC pesticide known to display neurotoxic effects, observing that it can react rapidly with bGP and readily inhibits its glycogenolytic activity (kinact = 1.4 × 10(5) m(-1) s(-1)). Using cysteine chemical labeling, mass spectrometry, and site-directed mutagenesis approaches, we show that thiram (and certain of its metabolites) alters the activity of bGP through the formation of an intramolecular disulfide bond (Cys(318)-Cys(326)), known to act as a redox switch that precludes the allosteric activation of bGP by AMP. Given the key role of glycogen metabolism in brain functions and neurodegeneration, impairment of the glycogenolytic activity of bGP by DTCs such as thiram may be a new mechanism by which certain DTCs exert their neurotoxic effects.

  8. Transformation of the Polish Banking Sector

    Directory of Open Access Journals (Sweden)

    Marek Stefański

    2009-07-01

    Full Text Available In the post-war period the banking system in Poland underwent two important system transitions: after 1946 and after 1989. The third transformation began after May 1, 2004, but it did not have a systemic character. The Polish banking sector started to operate on the Single European Market. The first part of the paper is devoted to the problems of the banks transformations after 1989 with a special focus on the quantitative development of banks in 19892008, and on subsequent privatisation and consolidation processes. The former intensified in 19891999, and the latter in 19992002. The consolidation process was very noticeable in the sector of cooperative banks after 1994. The second part of the paper includes an economic and financial analysis of the banks. A lot of attention was paid to the liquidity of the banking sector. It was assessed as good, which was confirmed by a short-term rating of Moodys and by the Financial Stability Report 2009, published by the National Bank of Poland in June 2009. The comparison of the net profit of the banking sector in 19972008 shows its dependence on the economic situation and policy. The number of banks with capital adequacy ratio well above the minimum required by the banking supervision is rising. The financial power ratings are not favorable for the domestic banks. The third part of the paper focuses on the development directions of the Polish banking sector. It may be concluded on the basis of the analysis that privatisation and consolidation processes will be continued. They will concentrate on the capital of foreign banks already operating in Poland. As compared with individual foreign banks, the potential of the Polish banking sector is week. The fourth part of the paper focuses on the presentation Polish banking sector in the context of European Union banking sector. The paper finishes with conclusions. Generally, Polish banks have to implement a strategy to enable them to compete on the Single

  9. The chemical and mechanical behaviors of polymer / reactive metal systems under high strain rates

    Science.gov (United States)

    Shen, Yubin

    As one category of energetic materials, impact-initiated reactive materials are able to release a high amount of stored chemical energy under high strain rate impact loading, and are used extensively in civil and military applications. In general, polymers are introduced as binder materials to trap the reactive metal powders inside, and also act as an oxidizing agent for the metal ingredient. Since critical attention has been paid on the metal / metal reaction, only a few types of polymer / reactive metal interactions have been studied in the literature. With the higher requirement of materials resistant to different thermal and mechanical environments, the understanding and characterization of polymer / reactive metal interactions are in great demand. In this study, PTFE (Polytetrafluoroethylene) 7A / Ti (Titanium) composites were studied under high strain rates by utilizing the Taylor impact and SHPB tests. Taylor impact tests with different impact velocities, sample dimensions and sample configurations were conducted on the composite, equipped with a high-speed camera for tracking transient images during the sudden process. SHPB and Instron tests were carried out to obtain the stress vs. strain curves of the composite under a wide range of strain rates, the result of which were also utilized for fitting the constitutive relations of the composite based on the modified Johnson-Cook strength model. Thermal analyses by DTA tests under different flow rates accompanied with XRD identification were conducted to study the reaction mechanism between PTFE 7A and Ti when only heat was provided. Numerical simulations on Taylor impact tests and microstructural deformations were also performed to validate the constitutive model built for the composite system, and to investigate the possible reaction mechanism between two components. The results obtained from the high strain rate tests, thermal analyses and numerical simulations were combined to provide a systematic study on

  10. Global mechanistic model of SOA formation: effects of different chemical mechanisms

    Directory of Open Access Journals (Sweden)

    G. Lin

    2011-09-01

    Full Text Available Recent experimental findings indicate that Secondary Organic Aerosol (SOA represents an important and, under many circumstances, the major fraction of the organic aerosol burden. Here, we use a global 3-d model (IMPACT to test the results of different mechanisms for the production of SOA. The basic mechanism includes SOA formation from organic nitrates and peroxides produced from an explicit chemical formulation, using partition coefficients based on thermodynamic principles. We also include the formation of non-evaporative SOA from the reaction of glyoxal and methylglyoxal on aqueous aerosols and cloud droplets as well as from the reaction of epoxides on aqueous aerosols. A model simulation including these SOA formation mechanisms gives an annual global SOA production of 113.5 Tg. The global production of SOA is substantially decreased to 85.0 Tg yr−1 if the HOx regeneration mechanism proposed by Peeters et al. (2009 is used. Model predictions with and without this HOx regeneration scheme are compared with multiple surface observation datasets, namely: the Interagency Monitoring of Protected Visual Environments (IMPROVE for the United States, the European Monitoring and Evaluation Programme (EMEP as well as Aerosol Mass Spectrometry (AMS data measured in both Northern Hemisphere and tropical forest regions. All model simulations realistically predict the organic carbon mass observed in the Northern Hemisphere, although they tend to overestimate the concentrations in tropical forest regions. This overestimate may result from an unrealistically high uptake rate of glyoxal and methylglyoxal on aqueous aerosols and in cloud drops. The modeled OC in the free troposphere is in agreement with measurements in the ITCT-2K4 aircraft campaign over the North America and in pollution layers in Asia during the INTEX-B campaign, although the model underestimates OC in the free troposphere during the ACE-Asia campaign off the

  11. Design Considerations of Polishing Lap for Computer-Controlled Cylindrical Polishing Process

    Science.gov (United States)

    Khan, Gufran S.; Gubarev, Mikhail; Speegle, Chet; Ramsey, Brian

    2010-01-01

    The future X-ray observatory missions, such as International X-ray Observatory, require grazing incidence replicated optics of extremely large collecting area (3 m2) in combination with angular resolution of less than 5 arcsec half-power diameter. The resolution of a mirror shell depends ultimately on the quality of the cylindrical mandrels from which they are being replicated. Mid-spatial-frequency axial figure error is a dominant contributor in the error budget of the mandrel. This paper presents our efforts to develop a deterministic cylindrical polishing process in order to keep the mid-spatial-frequency axial figure errors to a minimum. Simulation studies have been performed to optimize the operational parameters as well as the polishing lap configuration. Furthermore, depending upon the surface error profile, a model for localized polishing based on dwell time approach is developed. Using the inputs from the mathematical model, a mandrel, having conical approximated Wolter-1 geometry, has been polished on a newly developed computer-controlled cylindrical polishing machine. We report our first experimental results and discuss plans for further improvements in the polishing process.

  12. Between Polish Positivism and American Capitalism: The Educational Agents' Experiment in the Polish-American Community, 1889-1914

    Science.gov (United States)

    Jaroszynska-Kirchmann, Anna D.

    2008-01-01

    "Ameryka-Echo" was one of the most popular Polish-language weeklies, published in the United States between 1889 and 1972. Its founder and owner, Antoni A. Paryski, consciously sought to transplant ideas of Polish Positivism to the Polish-American immigrant communities in the United States. Reading was a central concept of…

  13. Photochemical modeling in California with two chemical mechanisms: model intercomparison and response to emission reductions.

    Science.gov (United States)

    Cai, Chenxia; Kelly, James T; Avise, Jeremy C; Kaduwela, Ajith P; Stockwell, William R

    2011-05-01

    An updated version of the Statewide Air Pollution Research Center (SAPRC) chemical mechanism (SAPRC07C) was implemented into the Community Multiscale Air Quality (CMAQ) version 4.6. CMAQ simulations using SAPRC07C and the previously released version, SAPRC99, were performed and compared for an episode during July-August, 2000. Ozone (O3) predictions of the SAPRC07C simulation are generally lower than those of the SAPRC99 simulation in the key areas of central and southern California, especially in areas where modeled concentrations are greater than the federal 8-hr O3 standard of 75 parts per billion (ppb) and/or when the volatile organic compound (VOC)/nitrogen oxides (NOx) ratio is less than 13. The relative changes of ozone production efficiency (OPE) against the VOC/NOx ratio at 46 sites indicate that the OPE is reduced in SAPRC07C compared with SAPRC99 at most sites by as much as approximately 22%. The SAPRC99 and SAPRC07C mechanisms respond similarly to 20% reductions in anthropogenic VOC emissions. The response of the mechanisms to 20% NOx emissions reductions can be grouped into three cases. In case 1, in which both mechanisms show a decrease in daily maximum 8-hr O3 concentration with decreasing NOx emissions, the O3 decrease in SAPRC07C is smaller. In case 2, in which both mechanisms show an increase in O3 with decreasing NOx emissions, the O3 increase is larger in SAPRC07C. In case 3, SAPRC07C simulates an increase in O3 in response to reduced NOx emissions whereas SAPRC99 simulates a decrease in O3 for the same region. As a result, the areas where NOx controls would be disbeneficial are spatially expanded in SAPRC07C. Although the results presented here are valuable for understanding differences in predictions and model response for SAPRC99 and SAPRC07C, the study did not evaluate the impact of mechanism differences in the context of the U.S. Environmental Protection Agency's guidance for using numerical models in demonstrating air quality attainment

  14. Tooth polishing: Relevance in present day periodontal practice

    Directory of Open Access Journals (Sweden)

    Madan Charu

    2009-01-01

    Full Text Available Time has seen the emergence of more efficient and effective devices like jet abrasives. However, the role of rubber cups with prophy angles cannot be overlooked as they are still being widely used and provide an economical alternative. Owing to several shortcomings associated with the air polishing device using sodium bicarbonate (NaHCO 3 , trends are shifting towards the usage of low abrasive powders. Recent demonstration of Glycine Powder Air Polishing (GPAP in removing subgingival biofilm results in less gingival erosion than hand instrumentation or NaHCO 3 air-polishing. Despite the emergence of latest advances in polishing, data suggesting selective polishing of teeth is compelling.

  15. Synthesis mechanism of sono-chemically prepared mesoporous ZnS nanoparticles

    Science.gov (United States)

    Motejadded Emrooz, H. B.; Jalaly, M.

    2017-03-01

    The mechanism of sono-chemically synthesized mesoporous ZnS nanoparticles has been investigated. ZnS nanoparticles were synthesized with a facile and quick method. The sonication process was carried out for several times up to 60 min. The synthesized particles have been characterized with scanning electron microscopy, transmission electron microscopy, high resolution x-ray diffraction, UV–visible technique, diffuse reflectance spectroscopy, Brunauer–Emmett–Teller and Fourier transformation infrared spectroscopy. Based on x-ray diffraction patterns, crystallite size and lattice strain increase with sonication time. Adsorption–desorption results showed that applying the sono-chemistry synthesizing method in the aqueous atmosphere will cause a mesoporous structure. The obtained specific surface area of the synthesized mesoporous ZnS nanoparticles varied from 53 to 58 m2 · g‑1. Also the surface areas created from the porosity of the particles varied from 27 to 29 m2 · g‑1. Regarding these results, the mechanism of porosity formation during synthesis of nanoparticles has been explained. Photocatalytic behavior of the synthesized particles has been investigated for degradation of methylene blue from aqueous solution. Factors affecting this behavior have been discussed and it was found that interaction between opposing factors caused the specimen synthesized with 40 min sonication time has the best methylene blue degradation efficiency.

  16. Uranium and thorium sequestration by a Pseudomonas sp.: mechanism and chemical characterization.

    Science.gov (United States)

    Kazy, Sufia K; D'Souza, S F; Sar, Pinaki

    2009-04-15

    The mechanism and chemical nature of uranium and thorium sequestration by a Pseudomonas strain was investigated by transmission electron microscopy, energy dispersive X-ray (EDX) analysis, FTIR spectroscopy and X-ray diffractometry. Atomic force microscopy (AFM) used in the tapping mode elucidated the morphological changes in bacterial cells following uranium and thorium binding. Transmission electron microscopy revealed intracellular sequestration of uranium and thorium throughout the cell cytoplasm with electron dense microprecipitations of accumulated metals. Energy dispersive X-ray analysis confirmed the cellular deposition of uranium and thorium. EDX and elemental analysis of sorption solution indicated the binding of uranium and thorium by the bacterial biomass via displacement of cellular potassium and calcium. The strong involvement of cellular phosphate, carboxyl and amide groups in radionuclide binding was ascertained by FTIR spectroscopy. X-ray powder diffraction (XRD) analyses confirmed cellular sequestration of crystalline uranium and thorium phosphates. Overall results indicate that a combined ion-exchange-complexation-microprecipitation mechanism could be involved in uranium and thorium sequestration by this bacterium. Atomic force microscopy and topography analysis revealed an undamaged cell surface with an increase in cell length, width and height following radionuclide accumulation. The arithmetic average roughness (R(a)) and root mean square (RMS) roughness (R(q)) values indicated an increase in surface roughness following uranium and thorium sequestration.

  17. Effect of mechanical and chemical clay removals by hydrocyclone and dispersants on coal flotation

    Energy Technology Data Exchange (ETDEWEB)

    Oats, W.J.; Ozdemir, O.; Nguyen, A.V. [University of Queensland, Brisbane, Qld. (Australia). School of Chemical Engineering

    2010-04-15

    Fine minerals, mostly clays, are known to have a detrimental effect on coal flotation. This paper focuses on the effect of mechanical and chemical removals of fine minerals by hydrocyclone and dispersants on coal flotation. The experimental results showed that the flotation recovery slightly increased from medium acidic to medium alkaline ranges. The flotation experiments carried out with dispersants at different dosages showed that the dispersants did not enhance the flotation recovery significantly. However, the removal of the fine fraction from the feed using a hydrocyclone significantly increased the flotation recovery. The bubble-particle attachment tests also indicated that the attachment time between an air bubble and the coal particles increased in the presence of clay particles. These attachment time results clearly showed that the clay particles adversely affected the flotation of coal particles by covering the coal surfaces which reduced the efficiency of bubble-coal attachment. An analysis based on the colloid stability theory showed that the clay coating was governed by the van der Waals attraction and that the double-layer interaction played a secondary role. It was also concluded that the best way to increase the flotation recovery in the presence of clays was to remove these fine minerals by mechanical means such as hydrocylones.

  18. A chemical mechanism to explain matrix effects in multi-collector ICP-MS

    Science.gov (United States)

    Mueller, B.

    2012-12-01

    A chemical mechanism is presented to explain many of the matrix effects observed in multi-collector inductively coupled plasma mass spectrometry (MC-ICP-MS). It suggests that breakdown products of the ion exchange resins used to remove sample matrix co-elute with samples and subsequently contaminates the uptake tubing and nebulizer of the ICP-MS. The sample path then contains stationary ligands and acts as a mini-column causing memory or carry-over that lead to the observed matrix effects. The minicolumn mechanism is used to explain: variations in sensitivity between samples and standards, variations in sensitivity on the addition of inorganic or organic matrix, changes in mass bias on the addition of matrix elements or column matrix, the coupling of sensitivity changes with mass bias changes, light isotope backgrounds, changes in mass bias with changes in analyte concentration, the poor reproducibility of the matrix effects, the reduction of mass bias with increasing matrix load and variations in mass bias across isotopes of the same element.

  19. Physico-chemical mechanisms governing the adherence of starch granules on materials with different hydrophobicities.

    Science.gov (United States)

    Detry, Jean G; Sindic, Marianne; Servais, Marjorie J; Adriaensen, Yasmine; Derclaye, Sylvie; Deroanne, Claude; Rouxhet, Paul G

    2011-03-01

    The factors influencing the adherence of starch were examined to improve the understanding of the mechanisms affecting soiling and cleanability. Therefore an aqueous suspension of starch granules was sprayed on four model substrates (glass, stainless steel, polystyrene and PTFE) and dried, and the substrates were cleaned using a radial-flow cell. The morphology of the soiled surfaces and the substrate chemical composition were also characterized. By influencing droplet spreading and competition between granule-substrate and granule-granule interfaces regarding the action of capillary forces, substrate wettability affected the shape and compactness of the adhering aggregates, the efficiency of shear forces upon cleaning, and finally the adherence of soiling particles. The rate of drying had an influence explained by the duration left to capillary forces for acting. X-ray photoelectron spectroscopy demonstrated the presence of macromolecules, mainly polysaccharides, which were adsorbed from the liquid phase, or carried by the retracting water film and deposited at the granule-substrate interface. These macromolecules acted as an adhesive joint, the properties of which seemed to be influenced by the detailed history of drying and subsequent exposure to humidity. In summary, the substrate surface energy affects the adherence of starch aggregates by different mechanisms which are all linked together: suspension droplet spreading, action of capillary forces, direct interaction with starch particles and interfacial macromolecules.

  20. Estrogenic endocrine-disrupting chemicals: molecular mechanisms of actions on putative human diseases.

    Science.gov (United States)

    Yoon, Kyungsil; Kwack, Seung Jun; Kim, Hyung Sik; Lee, Byung-Mu

    2014-01-01

    Endocrine-disrupting chemicals (EDC), including phthalates, bisphenol A (BPA), phytoestrogens such as genistein and daidzein, dichlorodiphenyltrichloroethane (DDT), and 2,3,7,8-tetrachlorodibenzo-p-dioxin (TCDD), are associated with a variety of adverse health effects in organisms or progeny by altering the endocrine system. Environmental estrogens, including BPA, phthalates, and phytoestrogens, are the most extensively studied and are considered to mimic the actions of endogenous estrogen, 17β-estradiol (E2). Diverse modes of action of estrogen and estrogen receptors (ERα and ERβ) have been described, but the mode of action of estrogenic EDC is postulated to be more complex and needs to be more clearly elucidated. This review examines the adverse effects of estrogenic EDC on male or female reproductive systems and molecular mechanisms underlying EDC effects that modulate ER-mediated signaling. Mechanisms of action for estrogenic EDC may involve both ER-dependent and ER-independent pathways. Recent findings from systems toxicology of examining estrogenic EDC are also discussed.

  1. Generalization of classical mechanics for nuclear motions on nonadiabatically coupled potential energy surfaces in chemical reactions.

    Science.gov (United States)

    Takatsuka, Kazuo

    2007-10-18

    Classical trajectory study of nuclear motion on the Born-Oppenheimer potential energy surfaces is now one of the standard methods of chemical dynamics. In particular, this approach is inevitable in the studies of large molecular systems. However, as soon as more than a single potential energy surface is involved due to nonadiabatic coupling, such a naive application of classical mechanics loses its theoretical foundation. This is a classic and fundamental issue in the foundation of chemistry. To cope with this problem, we propose a generalization of classical mechanics that provides a path even in cases where multiple potential energy surfaces are involved in a single event and the Born-Oppenheimer approximation breaks down. This generalization is made by diagonalization of the matrix representation of nuclear forces in nonadiabatic dynamics, which is derived from a mixed quantum-classical representation of the electron-nucleus entangled Hamiltonian [Takatsuka, K. J. Chem. Phys. 2006, 124, 064111]. A manifestation of quantum fluctuation on a classical subsystem that directly contacts with a quantum subsystem is discussed. We also show that the Hamiltonian thus represented gives a theoretical foundation to examine the validity of the so-called semiclassical Ehrenfest theory (or mean-field theory) for electron quantum wavepacket dynamics, and indeed, it is pointed out that the electronic Hamiltonian to be used in this theory should be slightly modified.

  2. Multiple stressor effects in Chlamydomonas reinhardtii – Toward understanding mechanisms of interaction between effects of ultraviolet radiation and chemical pollutants

    Energy Technology Data Exchange (ETDEWEB)

    Korkaric, Muris [Eawag, Swiss Federal Institute of Aquatic Science and Technology, Department of Environmental Toxicology, 8600, Duebendorf (Switzerland); ETH Zürich, Institute of Biogeochemistry and Pollutant Dynamics, 8092 Zürich (Switzerland); Behra, Renata; Fischer, Beat B. [Eawag, Swiss Federal Institute of Aquatic Science and Technology, Department of Environmental Toxicology, 8600, Duebendorf (Switzerland); Junghans, Marion [Swiss Center for Applied Ecotoxicology Eawag-EPFL, 8600, Duebendorf (Switzerland); Eggen, Rik I.L., E-mail: rik.eggen@eawag.ch [Eawag, Swiss Federal Institute of Aquatic Science and Technology, Department of Environmental Toxicology, 8600, Duebendorf (Switzerland); ETH Zürich, Institute of Biogeochemistry and Pollutant Dynamics, 8092 Zürich (Switzerland)

    2015-05-15

    Highlights: • Systematic study of multiple stressor effects of UVR and chemicals in C. reinhardtii. • UVR and chemicals did not act independently on algal photosynthesis and reproduction. • Multiple stressor effects of UVR and chemicals depended on chemical MOA. • Synergistic effect interactions not limited to oxidative stress inducing chemicals. • Multiple MOAs of UVR may limit applicability of current prediction models. - Abstract: The effects of chemical pollutants and environmental stressors, such as ultraviolet radiation (UVR), can interact when organisms are simultaneously exposed, resulting in higher (synergistic) or lower (antagonistic) multiple stressor effects than expected based on the effects of single stressors. Current understanding of interactive effects is limited due to a lack of mechanism-based multiple stressor studies. It has been hypothesized that effect interactions may generally occur if chemical and non-chemical stressors cause similar physiological effects in the organism. To test this hypothesis, we exposed the model green alga Chlamydomonas reinhardtii to combinations of UVR and single chemicals displaying modes of action (MOA) similar or dissimilar to the impact of UVR on photosynthesis. Stressor interactions were analyzed based on the independent action model. Effect interactions were found to depend on the MOA of the chemicals, and also on their concentrations, the exposure time and the measured endpoint. Indeed, only chemicals assumed to cause effects on photosynthesis similar to UVR showed interactions with UVR on photosynthetic yield: synergistic in case of Cd(II) and paraquat and antagonistic in case of diuron. No interaction on photosynthesis was observed for S-metolachlor, which acts dissimilarly to UVR. However, combined effects of S-metolachlor and UVR on algal reproduction were synergistic, highlighting the importance of considering additional MOA of UVR. Possible mechanisms of stressor effect interactions are

  3. Activation of chemical biological defense mechanisms and remission of vital oxidative injury by low dose radiation

    Energy Technology Data Exchange (ETDEWEB)

    Yamaoka, K. [Okayama University Medical School, Okayama (Japan); Nomura, T. [Central Research Institute of Electric Power Industry, Tokyo (Japan); Kojima, S. [Science University of Tokyo, Chiba (Japan)

    2000-05-01

    Excessive active oxygen produced in vivo by various causes is toxic. Accumulation of oxidation injuries due to excessive active causes cell and tissue injuries, inducing various pathologic conditions such as aging and carcinogenesis. On the other hand, there are chemical defense mechanisms in the body that eliminate active oxygen or repair damaged molecules, defending against resultant injury. It is interesting reports that appropriate oxidation stress activate the chemical biological defense mechanisms. In this study, to elucidate these phenomena and its mechanism by low dose radiation, we studied on the below subjects. Activation of chemical biological defense mechanisms by low dose radiation: (1) The effects radiation on lipid peroxide (LPO) levels in the organs, membrane fluidity and the superoxide dismutase (SOD) activity were examined in rats and rabbits. Rats were irradiated with low dose X-ray over their entire bodies, and rabbits inhaled vaporized radon spring water, which primarily emitted {alpha}-ray. The following results were obtained. Unlike high dose X-ray, low dose X-ray and radon inhalation both reduced LPO levels and made the state of the SH-group on membrane-bound proteins closer to that of juvenile animals, although the sensitivity to radioactivity varied depending on the age of the animals and among different organs and tissues. The SOD activity was elevated, suggesting that low dose X-ray and radon both activate the host defensive function. Those changes were particularly marked in the organs related to immune functions of the animals which received low dose X-ray, while they were particularly marked in the brain after radon inhalation. It was also found that those changes continued for longer periods after low dose X-irradiation. (2) Since SOD is an enzyme that mediates the dismutation of O{sub 2}- to H{sub 2}O{sub 2}, the question as to whether the resultant H{sub 2}O{sub 2} is further detoxicated into H{sub 2}O and O{sub 2} or not must

  4. Inquiry guided learning in a chemical engineering core curriculum: General instructional approach and specific application to the fluid mechanics case

    OpenAIRE

    Atilhan, Mert; Eljack, Fadwa; Alfadala, Hassan; Froyd, Jeffrey E.; El-Halwagi, Mahmoud; Mahalec, Vladimir

    2014-01-01

    This paper presents results from a preliminary study of the effectiveness of using inquiry-guided learning instructional strategies both in chemical engineering classrooms and laboratories. For readers unfamiliar with the instructional strategy, the paper describes the general approach and then reports on results of its application for the fluid mechanics course taken by undergraduate students in the Chemical Engineering Department at Qatar University. Inquiry-guided activities were developed...

  5. Polish Government policy for coal (1989-2006)

    Energy Technology Data Exchange (ETDEWEB)

    Piotr Zientara

    2007-07-01

    The purpose of this paper is to discuss and assess the consecutive Governments' policy for coal (1989-2006) in the context of the systemic transformation of the Polish economy. The paper presents a critical analysis of the rationale and effectiveness of government efforts to restructure the Polish coal mining industry in the light of economic theory, published literature, and a survey of three collieries. Some parallels, toutes proportions gardees, are drawn between the situation in the UK under Margaret Thatcher and that in Poland. The paper argues that, despite throwing billions of zlotys at the industry in the form of direct subsidies and debt write-offs, decision makers failed to make the collieries economically sound. The weaknesses of the consecutive governments - manifesting itself, amongst other things, in the unwillingness and/or inability to confront the miners' unions, to introduce market mechanisms into the sector, to ensure competent management and, crucially, to press on with nationwide economic liberalisation - are seen as the principal reasons behind the failure.

  6. On the failure mechanism of chemically embrittled Cu3Au single crystals

    Science.gov (United States)

    Cassagne, T. B.; Flanagan, W. F.; Lichter, B. D.

    1986-04-01

    In order to distinguish between “true” transgranular stress-corrosion cracking (T-SCC) and the “chemical embrittlement” previously described for Cu3Au single crystals (Bakish, AIME Trans., 1957), copper-25 atomic percent gold single crystals were subject to constant deflection (a) while immersed in aqueous ferric chloride or (b) in air after undergoing stress-free corrosion for 10 and 30 days in aqueous ferric chloride. In the conventional stress-corrosion testing mode carried out at the corrosion potential and at applied anodic and cathodic overpotentials, SEM observation and microprobe analysis revealed that characteristic T-SCC fracture surfaces were produced without the occurrence of massive dealloying, at least over a 0.1 micrometer depth. For bending tests in air following stress-free corrosion at the corrosion potential, a 30-day sample was completely converted into a brittle, virtually pure gold “sponge” while retaining the external shape and orientation of the original alloy single crystal. The fracture surface of this sample revealed relatively flat facets separated by irregularly serrated steps, as are seen in conventional cleavage. However, the surface is porous with a mean pore size of ˜0.1 micrometer. For the 10-day sample, bending produced multiple cracks in a massively dealloyed layer (gold-rich sponge). Several of these cracks propagated into the unattacked, normally ductile alloy for distances up to ˜20 micrometers. Interpretation of these results leads to an alternative explanation for the “chemical embrittlement” previously observed and offers significant new insights on the mechanisms of T-SCC.

  7. Anisotropic mechanical amorphization drives wear in diamond.

    Science.gov (United States)

    Pastewka, Lars; Moser, Stefan; Gumbsch, Peter; Moseler, Michael

    2011-01-01

    Diamond is the hardest material on Earth. Nevertheless, polishing diamond is possible with a process that has remained unaltered for centuries and is still used for jewellery and coatings: the diamond is pressed against a rotating disc with embedded diamond grit. When polishing polycrystalline diamond, surface topographies become non-uniform because wear rates depend on crystal orientations. This anisotropy is not fully understood and impedes diamond's widespread use in applications that require planar polycrystalline films, ranging from cutting tools to confinement fusion. Here, we use molecular dynamics to show that polished diamond undergoes an sp(3)-sp(2) order-disorder transition resulting in an amorphous adlayer with a growth rate that strongly depends on surface orientation and sliding direction, in excellent correlation with experimental wear rates. This anisotropy originates in mechanically steered dissociation of individual crystal bonds. Similarly to other planarization processes, the diamond surface is chemically activated by mechanical means. Final removal of the amorphous interlayer proceeds either mechanically or through etching by ambient oxygen.

  8. Effect of chemical and mechanical weed control on cassava yield, soil quality and erosion under cassava cropping system

    Science.gov (United States)

    Islami, Titiek; Wisnubroto, Erwin; Utomo, Wani

    2016-04-01

    Three years field experiments were conducted to study the effect of chemical and mechanical weed control on soil quality and erosion under cassava cropping system. The experiment were conducted at University Brawijaya field experimental station, Jatikerto, Malang, Indonesia. The experiments were carried out from 2011 - 2014. The treatments consist of three cropping system (cassava mono culture; cassava + maize intercropping and cassava + peanut intercropping), and two weed control method (chemical and mechanical methods). The experimental result showed that the yield of cassava first year and second year did not influenced by weed control method and cropping system. However, the third year yield of cassava was influence by weed control method and cropping system. The cassava yield planted in cassava + maize intercropping system with chemical weed control methods was only 24 t/ha, which lower compared to other treatments, even with that of the same cropping system used mechanical weed control. The highest cassava yield in third year was obtained by cassava + peanuts cropping system with mechanical weed control method. After three years experiment, the soil of cassava monoculture system with chemical weed control method possessed the lowest soil organic matter, and soil aggregate stability. During three years of cropping soil erosion in chemical weed control method, especially on cassava monoculture, was higher compared to mechanical weed control method. The soil loss from chemical control method were 40 t/ha, 44 t/ha and 54 t/ha for the first, second and third year crop. The soil loss from mechanical weed control method for the same years was: 36 t/ha, 36 t/ha and 38 t/ha. Key words: herbicide, intercropping, soil organic matter, aggregate stability.

  9. Characterization and Modeling of a Coupled Thermal-Hydrological-Mechanical-Chemical-Biological Experimental Facility at DUSEL

    Science.gov (United States)

    Sonnenthal, E. L.; Elsworth, D.; Lowell, R. P.; Maher, K.; Mailloux, B. J.; Uzunlar, N.; Conrad, M. E.; Jones, T. L.; Olsen, N. J.

    2010-12-01

    A design is being formulated for a large-scale subsurface experimental facility at the 4850 foot level of the Homestake Mine in South Dakota. The purpose of the experiment is to investigate coupled Thermal-Hydrological-Mechanical-Chemical-Biological (THMCB) processes in fractured rock under stress and would be part of the proposed Deep Underground Science and Engineering Laboratory (DUSEL). Key questions we propose to answer are: 1) What are the effective reaction rates for mineral-fluid interaction in fractured rock under stress?; 2) How does mineral and fluid chemistry affect fracture mechanical behavior and permeability changes under stress at elevated temperatures?; and 3) How do microbial communities evolve in fractured rock under a thermal gradient and under changing stress conditions? In addition to the experiment as an in-situ laboratory for studying crustal processes, it has significant benefits for evaluating stimulation and production in Enhanced Geothermal Systems. Design and planning of the experiment included characterization of the geological, chemical, and isotopic characteristics of the rock and seeping fluids, thermal-hydrological and reactive transport modeling. During a reconnaissance study, strong heterogeneity in fracture fluxes and permeability were observed at the block site with some open boreholes continuously flowing at up to 1 liter/minute, and locally elevated fluid temperatures. A two-dimensional thermal-hydrological model was developed to evaluate fluid fluxes and temperatures as a function of heat input and borehole heater configuration. The dual permeability model considers fluid flow and heat transfer between an array of fractures and rock matrix, both having permeability anisotropy. A horizontal rock matrix permeability of 10-18 m2 was based on recent lab measurements, with a vertical matrix permeability estimated to be one order-of-magnitude higher to account for the strong nearly vertical foliation in the Homestake and Poorman

  10. Physico-chemical phenomena during mechanical thermal expression of water in low rank coal

    Energy Technology Data Exchange (ETDEWEB)

    Alan L. Chaffee; Yuli Aranto; Christian Bergins; Janine Hulston; Marc Marshall; Haruo Kumagai [Monash University, Vic. (Australia). School of Chemistry

    2007-07-01

    Mechanical thermal expression (MTE) is a non-evaporative method for water removal from low rank coal with typical processing conditions in the range 150-220{sup o}C and 10-20 MPa of applied mechanical pressure. Using a range of analytical methods, this study probes physico-chemical changes in the coal structure that occur as a result of MTE processing and, also, molecular dynamic behaviour under MTE conditions. Mercury intrusion porosimetry (MIP), after appropriately compensating for the coal's compressibility, showed that progressively harsher MTE conditions led to a reduction in the concentration of macropores and a concomitant increase in the concentration of mesopores. However, since MIP requires the use of dried samples, it does not facilitate the examination of 'as-received' samples. Using small angle X-ray scattering (SAXS) it was possible to examine the MTE products in both their wet and dry states enabling the pore volume reduction upon drying to be observed. Also, consideration of the SAXS and MIP results in combination, suggests that the abundance of 'closed' (meso)pores is reduced at higher MTE processing temperatures. The dynamic nature of coal molecular structure under MTE processing conditions has been probed for the first time using {sup 1}H-NMR transverse relaxation rate (T2) measurements. The data suggest that water exerts a 'plasticising' effect, enhancing the mobility of the coal structure at elevated temperature. This enhanced mobility (softening) presumably facilitates the reorganization of molecular structure, enabling the changes in porosity identified by MIP and SAXS. 22 refs., 8 figs., 1 tab.

  11. Corn silage management I: effects of hybrid, maturity, and mechanical processing on chemical and physical characteristics.

    Science.gov (United States)

    Johnson, L M; Harrison, J H; Davidson, D; Robutti, J L; Swift, M; Mahanna, W C; Shinners, K

    2002-04-01

    Two experiments were conducted to evaluate the effects of hybrid, maturity, and mechanical processing of whole plant corn on chemical and physical characteristics, particle size, pack density, and dry matter recovery. In the first experiment, hybrid 3845 whole plant corn was harvested at hard dough, one-third milkline, and two-thirds milkline with a theoretical length-of-cut of 6.4 mm. In the second experiment, hybrids 3845 and Quanta were harvested at one-third milkline, two-thirds milkline, and blackline stages of maturity with a theoretical length-of-cut of 12.7 mm. At each stage of maturity, corn was harvested with and without mechanical processing by using a John Deere 5830 harvester with an onboard kernel processor. The percentage of intact corn kernels present in unprocessed corn silage explained 62% of variation in total tract starch digestibility. As the amount of intact kernels increased, total tract starch digestibility decreased. Post-ensiled vitreousness of corn kernels within the corn silage explained 31 and 48% of the variation of total tract starch digestibility for processed and unprocessed treatments, respectively. For a given amount of vitreous starch in corn kernels, total tract starch digestibility was lower for cows fed unprocessed corn silage compared with processed corn silage. This suggests that processing corn silage disrupts the dense protein matrix within the corn kernel where starch is embedded, therefore making the starch more available for digestion. Particle size of corn silage and orts that contained corn silage was reduced when it was processed. Wet pack density was greater for processed compared with unprocessed corn silage.

  12. Lacquer polishing of X-ray optics

    Science.gov (United States)

    Catura, R. C.; Joki, E. G.; Roethig, D. T.; Brookover, W. J.

    1987-01-01

    Techniques for polishing figured X-ray optics by a lacquer-coating process are described. This acrylic lacquer coating has been applied with an optical quality of an eighth-wave in red light and very effectively covers surface roughness with spatial wavelengths less than about 0.2 mm. Tungsten films have been deposited on the lacquer coatings to provide highly efficient X-ray reflectivity.

  13. Integrated Surface Topography Characterization of Variously Polished Niobium for Superconducting Particle Accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Hui Tian, Charles Reece, Michael Kelley, G. Ribeill

    2009-05-01

    As superconducting niobium radio-frequency (SRF) cavities approach fundamental material limits, there is increased interest in understanding the details of topographical influences on realized performance limitations. Micro-and nano-roughness are implicated in both direct geometrical field enhancements as well as complications of the composition of the 50 nm surface layer in which the super-currents flow. Interior surface chemical polishing (BCP/EP) to remove mechanical damage leaves surface topography, including pits and protrusions of varying sharpness. These may promote RF magnetic field entry, locally quenching superconductivity, so as to degrade cavity performance. A more incisive analysis of surface topography than the widely-used average roughness is needed. In this study, a power spectral density (PSD) approach based on Fourier analysis of surface topography data acquired by both stylus profilometry and atomic force microscopy (AFM) is being used to distinguish the scale-dependent smoothing effects. The topographical evolution of the Nb surface as a function of different steps of EP is reported, resulting in a novel qualitative and quantitative description of Nb surface topography.

  14. EFFECTS OF POLISHING PARAMETERS ON MATERIAL REMOVAL FOR CURVED OPTICAL GLASSES IN BONNET POLISHING

    Institute of Scientific and Techni