WorldWideScience

Sample records for beam sputtering techniques

  1. Thickness effect on properties of titanium film deposited by d.c. magnetron sputtering and electron beam evaporation techniques

    Indian Academy of Sciences (India)

    Nishat Arshi; Junqing Lu; Chan Gyu Lee; Jae Hong Yoon; Bon Heun Koo; Faheem Ahmed

    2013-10-01

    This paper reports effect of thickness on the properties of titanium (Ti) film deposited on Si/SiO2 (100) substrate using two different methods: d.c. magnetron sputtering and electron beam (e-beam) evaporation technique. The structural and morphological characterization of Ti film were performed using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). XRD pattern revealed that the films deposited using d.c. magnetron sputtering have HCP symmetry with preferred orientation along (002) plane, while those deposited with e-beam evaporation possessed fcc symmetry with preferred orientation along (200) plane. The presence of metallic Ti was also confirmed by XPS analysis. FESEM images depicted that the finite sized grains were uniformly distributed on the surface and AFM micrographs revealed roughness of the film. The electrical resistivity measured using four-point probe showed that the film deposited using d.c. magnetron sputtering has lower resistivity of ∼13 cm than the film deposited using e-beam evaporation technique, i.e. ∼60 cm. The hardness of Ti films deposited using d.c. magnetron sputtering has lower value (∼7.9 GPa) than the film deposited using e-beam technique (∼9.4 GPa).

  2. Structural and optical properties of ZnO fabricated by reactive e-beam and rf magnetron sputtering techniques

    Energy Technology Data Exchange (ETDEWEB)

    Al Asmar, R.; Ferblantier, G.; Mailly, F.; Foucaran, A. [Centre d' Electronique et de Micro-optoelectronique de Montpellier, Unite mixte de Recherche du CNRS n 5507, Universite Montpellier II, Place E. Bataillon, 34095 Montpellier (France)

    2005-03-01

    Zinc oxide thin films have been grown on (100)-oriented silicon substrate by reactive e-beam evaporation and rf magnetron sputtering techniques and a comparative study is discussed in this paper. Structural, electrical and optical characteristics have been studied before and after annealing in air by measurements of X-ray diffraction, real parts of the dielectric coefficient, and electrical resistivity. X-ray diffraction measurements have shown that ZnO films are highly c-axis-oriented with a full width at half maximum (FWMH) lower than 0.5 . The electrical resistivity is about 10{sup 11} {omega}.cm for magnetron sputtered films and it increases from 10{sup -2} {omega}.cm to about 10{sup 9} {omega}.cm after annealing at 750 C for electron beam evaporated films. Ellipsometry measurements have shown some improvement of the real dielectric coefficient after annealing treatment at 750 C of the ZnO evaporated by electron beam. The AFM images show that the surfaces of the e-beam evaporated ZnO and of the sputtered ZnO are relatively smooth. (copyright 2005 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  3. Confined ion beam sputtering device and method

    Science.gov (United States)

    Sharp, D.J.

    1986-03-25

    A hollow cylindrical target, lined internally with a sputter deposit material and open at both ends, surrounds a substrate on which sputtered deposition is to be obtained. An ion beam received through either one or both ends of the open cylindrical target is forced by a negative bias applied to the target to diverge so that ions impinge at acute angles at different points of the cylindrical target surface. The ion impingement results in a radially inward and downstream directed flux of sputter deposit particles that are received by the substrate. A positive bias applied to the substrate enhances divergence of the approaching ion beams to generate a higher sputtered deposition flux rate. Alternatively, a negative bias applied to the substrate induces the core portion of the ion beams to reach the substrate and provide ion polishing of the sputtered deposit thereon.

  4. Preliminary results on adhesion improvement using Ion Beam Sputtering Deposition

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Yonggi; Kim, Bomsok; Lee, Jaesang [Korea Atomic Energy Research Institute, Daejeon (Korea, Republic of)

    2013-05-15

    Sputtering is an established technique for depositing films with smooth surfaces and interfaces and good thick control. Ejection of articles from a condensed matter due to impingement of high energy particles, termed as sputtering was observed as early as in 1852, however, it is only recently that the complex process of sputtering system. Coating adhesion and environmental stability of the ion beam sputtering deposition coatings performed very well. High-energy high-current ion beam thin film synthesis of adhesion problems can be solved by using. Enhancement of adhesion in thin film synthesis, using high energy and high current ion beam, of mobile phones, car parts and other possible applications in the related industry Alternative technology of wet chrome plating, considering environment and unit cost, for car parts and esthetic improvement on surface of domestic appliances.

  5. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  6. Sputtering. [as deposition technique in mechanical engineering

    Science.gov (United States)

    Spalvins, T.

    1976-01-01

    This paper primarily reviews the potential of using the sputtering process as a deposition technique; however, the manufacturing and sputter etching aspects are also discussed. Since sputtering is not regulated by classical thermodynamics, new multicomponent materials can be developed in any possible chemical composition. The basic mechanism for dc and rf sputtering is described. Sputter-deposition is described in terms of the unique advantageous features it offers such as versatility, momentum transfer, stoichiometry, sputter-etching, target geometry (coating complex surfaces), precise controls, flexibility, ecology, and sputtering rates. Sputtered film characteristics, such as strong adherence and coherence and film morphology, are briefly evaluated in terms of varying the sputtering parameters. Also described are some of the specific industrial areas which are turning to sputter-deposition techniques.

  7. Alloying of metal nanoparticles by ion-beam induced sputtering

    Science.gov (United States)

    Magudapathy, P.; Srivastava, S. K.; Gangopadhyay, P.; Amirthapandian, S.; Saravanan, K.; Das, A.; Panigrahi, B. K.

    2017-01-01

    Ion-beam sputtering technique has been utilized for controlled synthesis of metal alloy nanoparticles of compositions that can be tuned. Analysis of various experimental results reveals the formation of Ag-Cu alloy nanoparticles on a silica substrate. Surface-plasmon optical resonance positions and observed shifts of Ag Bragg angles in X-ray diffraction pattern particularly confirm formation of alloy nanoparticles on glass samples. Sputtering induced nano-alloying mechanism has been discussed and compared with thermal mixing of Ag and Cu thin films on glass substrates. Compositions and sizes of alloy nanoparticles formed during ion-beam induced sputtering are found to exceed far from the values of thermal mixing.

  8. Monte Carlo simulations of nanoscale focused neon ion beam sputtering.

    Science.gov (United States)

    Timilsina, Rajendra; Rack, Philip D

    2013-12-13

    A Monte Carlo simulation is developed to model the physical sputtering of aluminum and tungsten emulating nanoscale focused helium and neon ion beam etching from the gas field ion microscope. Neon beams with different beam energies (0.5-30 keV) and a constant beam diameter (Gaussian with full-width-at-half-maximum of 1 nm) were simulated to elucidate the nanostructure evolution during the physical sputtering of nanoscale high aspect ratio features. The aspect ratio and sputter yield vary with the ion species and beam energy for a constant beam diameter and are related to the distribution of the nuclear energy loss. Neon ions have a larger sputter yield than the helium ions due to their larger mass and consequently larger nuclear energy loss relative to helium. Quantitative information such as the sputtering yields, the energy-dependent aspect ratios and resolution-limiting effects are discussed.

  9. Nanofabrication by ion-beam sputtering fundamentals and applications

    CERN Document Server

    Som, Tapobrata

    2012-01-01

    Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attractive. This book reviews various fascinating results, understand the underlying physics of ion induced pattern formation, to highlight the potential applications of the patterned surfaces, and to explore the patterning behavior by different irradiation

  10. Ion beam sputtering of Ag – Angular and energetic distributions of sputtered and scattered particles

    Energy Technology Data Exchange (ETDEWEB)

    Feder, René, E-mail: rene.feder@iom-leipzig.de; Bundesmann, Carsten; Neumann, Horst; Rauschenbach, Bernd

    2013-12-01

    Ion beam sputter deposition (IBD) provides intrinsic features which influence the properties of the growing film, because ion properties and geometrical process conditions generate different energy and spatial distribution of the sputtered and scattered particles. A vacuum deposition chamber is set up to measure the energy and spatial distribution of secondary particles produced by ion beam sputtering of different target materials under variation of geometrical parameters (incidence angle of primary ions and emission angle of secondary particles) and of primary ion beam parameters (ion species and energies). A representative set of Ag thin films is deposited arranged on a substrate holder equatorial to the Ag target in steps of 10° and characterized concerning their film thickness by profilometry to determine the angular distribution of the sputtered particles. The film thickness distributions show a tilted, cosine-like shape and a shifting of the maximum position depending on the primary particle energy and incidence angle of the primary ions. The energy distributions of sputtered and scattered ions and of sputtered neutrals are measured with an energy-selective mass spectrometer. The average energy of the sputtered ions increases with increasing emission angle and also increases with increasing incidence angle of the primary ions. In contrast, the average energy of the sputtered ions is nearly unaffected by the primary particle energy and particle species. The energy distribution of the scattered Ar ions reveals high energetic maxima which shift with increasing emission angle to higher energies. These maxima are not observed for Xe bombardment. The total energies of sputtered and scattered ions show significant differences between the two bombarding species. The maximum of the energy distribution of sputtered Ag neutrals is used to conclude on the surface binding energy of Ag (2.72 eV). All experimental data are compared with Monte Carlo simulations done with

  11. Characterization of Hydroxyapatite Film on Titanium Substrate by Sputtering Technique

    Institute of Scientific and Technical Information of China (English)

    2005-01-01

    Radiofrequent magnetron sputtering technique was used to produce calcium phosphate coated on the titanium substrates, and the sputtered coating films were crystallized in an autoclave at 110 ℃ using a low temperature hydrothermal technique. The crystallization of as- sputtered coating film on the titanium substrates were amorphous calcium phosphate film. However, after the hydrothermal technique, calcium phosphate crystals grew and these were columnar crystal. The Ca/ P ratio of sputtered coating films in 1.6 to 2.0.

  12. Low current beam techniques

    Energy Technology Data Exchange (ETDEWEB)

    Saint, A.; Laird, J.S.; Bardos, R.A.; Legge, G.J.F. [Melbourne Univ., Parkville, VIC (Australia). School of Physics; Nishijima, T.; Sekiguchi, H. [Electrotechnical Laboratory, Tsukuba (Japan).

    1993-12-31

    Since the development of Scanning Transmission Microscopy (STIM) imaging in 1983 many low current beam techniques have been developed for the scanning (ion) microprobe. These include STIM tomography, Ion Beam Induced Current, Ion Beam Micromachining and Microlithography and Ionoluminense. Most of these techniques utilise beam currents of 10{sup -15} A down to single ions controlled by beam switching techniques This paper will discuss some of the low beam current techniques mentioned above, and indicate, some of their recent applications at MARC. A new STIM technique will be introduced that can be used to obtain Z-contrast with STIM resolution. 4 refs., 3 figs.

  13. Properties of tin oxides prepared by ion-beam-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Becker, Martin; Hamann, Robert; Polity, Angelika; Feili, Davar; Meyer, Bruno K. [I. Physikalisches Institut, Justus-Liebig-Universitaet Giessen, Heinrich-Buff-Ring 16, 35392 Giessen (Germany)

    2013-07-01

    The success of n-type oxide semiconductors and its application in oxide-based electronic devices has motivated the interest in p-type oxide based semiconductors. Therefore synthesis of tin monoxide (SnO) recently has received increasing attention. Another phase of this binary system, SnO{sub 2}, is of great technological interest in manifold applications, such as transparent electrodes, heat-reflecting filters and gas sensing. The preparation of tin oxide thin films has been performed by many different procedures such as sol/gel, epitaxial procedures or methods working under vacuum conditions like sputtering techniques. Radio-Frequency-Ion-Thrusters, as designed for propulsion applications, are also qualified for thin film deposition and surface etching if utilized as ion source. Tin oxide thin films were grown by ion-beam sputtering using a 3 inch metallic tin target. Different aspects of growth and properties of the tin oxide phases were investigated in relation to growth parameters such as substrate temperature or flux of oxygen. Structural, optical and electrical properties of the films are discussed.

  14. A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS)

    Science.gov (United States)

    Loch, D. A. L.; Ehiasarian, A. P.

    2012-09-01

    Sputtering magnetic materials with magnetron based systems has the disadvantage of field quenching and variation of alloy composition with target erosion. The advantage of eliminating magnetic fields in the chamber is that this enables sputtered particles to move along the electric field more uniformly. Inductively coupled impulse sputtering (ICIS) is a form of high power impulse magnetron sputtering (HIPIMS) without a magnetic field where a high density plasma is produced by a high power radio frequency (RF) coil in order to sputter the target and ionise the metal vapour. In this emerging technology, the effects of power and pressure on the ionisation and deposition process are not known. The setup comprises of a 13.56 MHz pulsed RF coil pulsed with a duty cycle of 25 %. A pulsed DC voltage of 1900 V was applied to the cathode to attract Argon ions and initiate sputtering. Optical emission spectra (OES) for Cu and Ti neutrals and ions at constant pressure show a linear intensity increase for peak RF powers of 500 W - 3400 W and a steep drop of intensity for a power of 4500 W. Argon neutrals show a linear increase for powers of 500 W - 2300 W and a saturation of intensity between 2300 W - 4500 W. The influence of pressure on the process was studied at a constant peak RF power of 2300 W. With increasing pressure the ionisation degree increased. The microstructure of the coatings shows globular growth at 2.95×10-2 mbar and large-grain columnar growth at 1.2×10-1 mbar. Bottom coverage of unbiased vias with a width of 0.360 μm and aspect ratio of 2.5:1 increased from 15 % to 20 % for this pressure range. The current work has shown that the concept of combining a RF powered coil with a magnet-free high voltage pulsed DC powered cathode is feasible and produces very stable plasma. The experiments have shown a significant influence of power and pressure on the plasma and coating microstructure.

  15. Microstructure and strain relaxation in thin nanocrystalline platinum films produced via different sputtering techniques

    Energy Technology Data Exchange (ETDEWEB)

    Gruber, Wolfgang, E-mail: wolfgang.gruber@tu-clausthal.de [Institut für Metallurgie, TU Clausthal, Robert-Koch-Str. 42, D38678 Clausthal-Zellerfeld (Germany); Baehtz, Carsten [Institut für Ionenstrahlphysik und Materialforschung, Helmholtz-Zentrum Dresden-Rossendorf, Dresden (Germany); Horisberger, Michael [Laboratory for Scientific Developments & Novel Materials (LDM), Paul-Scherrer-Institute, Villigen PSI (Switzerland); Ratschinski, Ingmar [Institut für Nichtmetallische Werkstoffe, TU Clausthal, Zehntnerstr. 2a, D-38678 Clausthal-Zellerfeld (Germany); Clausthaler Zentrum für Materialtechnik, Leibnizstraße 9, D-38678 Clausthal-Zellerfeld (Germany); Schmidt, Harald [Institut für Metallurgie, TU Clausthal, Robert-Koch-Str. 42, D38678 Clausthal-Zellerfeld (Germany); Clausthaler Zentrum für Materialtechnik, Leibnizstraße 9, D-38678 Clausthal-Zellerfeld (Germany)

    2016-04-15

    Graphical abstract: - Highlights: • Residual strain relaxation in nano crystalline platinum films was investigated. • Magnetron sputtered and ion beam sputtered Pt films are compared. • XRD measurements were carried out using synchrotron radiation. • Thickness fringes in the Bragg peak give information on microstructure. • Residual strain relaxation is stronger in films composed of equally oriented columns. - Abstract: In this study we investigated the correlation between microstructure and residual strain relaxation in nanocrystalline Pt films with a thickness of about 20 nm produced by different deposition techniques: magnetron sputtering and ion beam sputtering. X-ray diffractometry was carried out using synchrotron radiation. The out-of-plane interplanar distance was measured during isothermal in situ annealing at temperatures between 130 °C und 210 °C. The thermoelastic expansion coefficient is equal for both types of nanocrystalline Pt films and slightly lower than for coarse grained Pt. The relaxation of residual out-of-plain strain depends on temperature and is significantly stronger in the case of the magnetron sputtered films than for the ion beam sputtered films. Different relaxation of compressive stress is ascribed to the different microstructures which evolve during deposition via the corresponding deposition technique. Thickness fringes around the (1 1 1) Bragg peak deposited via magnetron sputtering reveal that these films are essentially composed of columnar (1 1 1) oriented grains which cover the whole film thickness. In contrast, no thickness fringes are observed around the (1 1 1) Bragg peak of films prepared by ion beam sputtering indicating a significantly different microstructure. This is confirmed by Electron Backscatter Diffraction which reveals a (1 1 1) texture for both types of films. The (1 1 1) texture, however, is significantly stronger in the case of the magnetron sputtered films. Grain growth at low homologous

  16. Large area ion beam sputtered YBa2Cu3O(7-delta) films for novel device structures

    Science.gov (United States)

    Gauzzi, A.; Lucia, M. L.; Kellett, B. J.; James, J. H.; Pavuna, D.

    1992-03-01

    A simple single-target ion-beam system is employed to manufacture large areas of uniformly superconducting YBa2Cu3O(7-delta) films which can be reproduced. The required '123' stoichiometry is transferred from the target to the substrate when ion-beam power, target/ion-beam angle, and target temperature are adequately controlled. Ion-beam sputtering is experimentally demonstrated to be an effective technique for producing homogeneous YBa2Cu3O(7-delta) films.

  17. Contamination control in ion beam sputter-deposited films

    Science.gov (United States)

    Pearson, David I. C.; Pochon, Sebastien; Cooke, Mike

    2013-09-01

    The conventional wisdom to guarantee high purity thin films in IBSD has been to use a large vacuum chamber usually in excess of 1 m3. The chamber size was important to minimise the effect of reflected high energy particles from the target surface sputtering chamber materials onto the substrate and to allow the use of large targets to avoid beam overspill onto chamber furniture. An improved understanding of beam trajectories and re-sputtered material paths has allowed the deposition of thin films with very low metallic impurity content in a chamber volume below 0.5 m3. Thus, by optimizing the sputter ion source, target and substrate configuration, and by arranging suitable shielding made of an appropriate material in the process chamber, the levels of contaminants in the deposited films have been reduced to a minimum. With this optimum hardware arrangement, the ion beam process parameters were then optimized with respect to the ppm levels of contaminants measured in the films by SIMS analysis. Using the deposition of SiO2 as a standard material for DSIMS composition analysis and impurity level determination, it has been shown that our IBS deposition tool is capable of depositing films with contamination levels of <50ppm for the total of all metal impurities in the deposited films.

  18. Beam optics optimization of a negative-ion sputter source

    Indian Academy of Sciences (India)

    F Osswald; R Rebmeister

    2002-11-01

    A negative-ion sputter source has been studied in order to increase the beam intensity delivered by the Vivitron tandem injector. The aim was to characterize the influence on the beam intensity of some factors related to the configuration of the source such as the shape of the target holder, the target surface topography and the anode/cathode voltage. The paper reports the results carried out by experimentation on a test facility and on the injector itself as well as the investigations performed with computer simulations.

  19. Ion beam and dual ion beam sputter deposition of tantalum oxide films

    Science.gov (United States)

    Cevro, Mirza; Carter, George

    1994-11-01

    Ion beam sputter deposition (IBS) and dual ion beam sputter deposition (DIBS) of tantalum oxide films was investigated at room temperature and compared with similar films prepared by e-gun deposition. Optical properties ie refractive index and extinction coefficient of IBS films were determined in the 250 - 1100 nm range by transmission spectrophotometry and at (lambda) equals 632.8 nm by ellipsometry. They were found to be mainly sensitive to the partial pressure of oxygen used as a reactive gas in the deposition process. The maximum value of the refractive index of IBS deposited tantalum oxide films was n equals 2.15 at (lambda) equals 550 nm and the extinction coefficient of order k equals 2 X 10-4. Films deposited by e-gun deposition had refractive index n equals 2.06 at (lambda) equals 550 nm. Films deposited using DIBS ie deposition assisted by low energy Ar and O2 ions (Ea equals 0 - 300 eV) and low current density (Ji equals 0 - 40 (mu) A/cm2) showed no improvement in the optical properties of the films. Preferential sputtering occurred at Ea(Ar) equals 300 eV and Ji equals 20 (mu) A/cm2 and slightly oxygen deficient films were formed. Different bonding states in the tantalum-oxide films were determined by x-ray spectroscopy while composition of the film and contaminants were determined by Rutherford scattering spectroscopy. Tantalum oxide films formed by IBS contained relatively high Ar content (approximately equals 2.5%) originating from the reflected argon neutrals from the sputtering target while assisted deposition slightly increased the Ar content. Stress in the IBS deposited films was measured by the bending technique. IBS deposited films showed compressive stress with a typical value of s equals 3.2 X 109 dyn/cm2. Films deposited by concurrent ion bombardment showed an increase in the stress as a function of applied current density. The maximum was s approximately equals 5.6 X 109 dyn/cm2 for Ea equals 300 eV and Ji equals 35 (mu) A/cm2. All

  20. Ion-beam and dual-ion-beam sputter deposition of tantalum oxide films

    Science.gov (United States)

    Cevro, Mirza; Carter, George

    1995-02-01

    Ion-beam sputter deposition (IBS) and dual-ion-beam sputter deposition (DIBS) of tantalum oxide films was investigated at room temperature and compared with similar films prepared by e-gun deposition. The optical properties, i.e., refractive index and extinction coefficient, of IBS films were determined in the 250- to 1100-nm range by transmission spectrophotometry and at (lambda) equals 632.8 nm by ellipsometry. They were found to be mainly sensitive to the partial pressure of oxygen used as a reactive gas in the deposition process. The maximum value of the refractive index of IBS deposited tantalum oxide films was n equals 2.15 at (lambda) equals 550 nm and the extinction coefficient of order k equals 2 X 10-4. Films deposited by e-gun deposition had refractive index n 2.06 at (lambda) equals 550 nm. Films deposited using DIBS, i.e., deposition assisted by low energy Ar and O2 ions (Ea equals 0 to 300 eV) and low current density (Ji equals 0 to 40 (mu) A/cm2), showed no improvement in the optical properties of the films. Preferential sputtering occurred at Ea(Ar) equals 300 eV and Ji equals 20 (mu) A/cm2 and slightly oxygen deficient films were formed. Different bonding states in the tantalum-oxide films were determined by x-ray spectroscopy, whereas composition of the film and contaminants were determined by Rutherford backscattering spectroscopy (RBS). Tantalum oxide films formed by IBS contained relatively high Ar content (approximately equals 2.5%) originating from the reflected argon neutrals from the sputtering target whereas assisted deposition slightly increased the Ar content. Stress in the IBS-deposited films was measured by the bending technique. IBS-deposited films showed compressive stress with a typical value of s equals 3.2 X 109 dyn/cm2. Films deposited by concurrent ion bombardment showed an increase in the stress as a function of applied current density. The maximum was s approximately equals 5.6 X 109 dyn/cm2 for Ea equals 300 eV and Ji equals

  1. Lifetime dependence of nitrided carbon stripper foils on sputter angle during N{sup +} ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Sugai, I., E-mail: isao.Sugai@kek.jp [High Energy Accelerator Research Organization, Accelerator Laboratory, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Oyaizu, M. [High Energy Accelerator Research Organization, Institute of Particle and Nuclear Studies, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Takeda, Y. [High Energy Accelerator Research Organization, Accelerator Laboratory, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Kawakami, H. [High Energy Accelerator Research Organization, Institute of Particle and Nuclear Studies, Oho 1-1, Tsukuba, Ibaraki 305-0801 (Japan); Kawasaki, K.; Hattori, T. [Department of Physics, Tokyo Institute of Technology, Ohokayama, Meguro, Tokyo 152-8550 (Japan); Kadono, T. [Department of Physics, University of Tokyo, Hongo, 7-3-1, Bunkyo, Tokyo 113-0033 (Japan)

    2015-09-01

    We fabricated high-lifetime thin nitride carbon stripper (NCS) foils with high nitrogen contents using ion-beam sputtering with reactive nitrogen gas and investigated the dependence of their lifetimes on the sputter angle. The nitrogen in carbon foils plays a critical role in determining their lifetime. Therefore, in order to investigate the effects of the nitrogen level in NCS foils on foil lifetime, we measured the sputtering yield for different sputter angles at a sputtering voltage of 10 kV while using carbon-based targets. We also measured the nitrogen-to-carbon thickness ratios of the foils using Rutherford backscattering spectrometry. The foils made at a sputter angle of 15° using a glassy amorphous carbon target exhibited an average increase of 200-fold in lifetime when compared to commercially available foils.

  2. Method of making an ion beam sputter-etched ventricular catheter for hydrocephalus shunt

    Science.gov (United States)

    Banks, B. A. (Inventor)

    1984-01-01

    The centricular catheter comprises a multiplicity of inlet microtubules. Each microtubule has both a large opening at its inlet end and a multiplicity of microscopic openings along its lateral surfaces. The microtubules are perforated by an ion beam sputter etch technique. The holes are etched in each microtubule by directing an ion beam through an electro formed mesh mask producing perforations having diameters ranging from about 14 microns to about 150 microns. This structure assures a reliable means for shunting cerebrospinal fluid from the cerebral ventricles to selected areas of the body.

  3. Pattern evolution during ion beam sputtering; reductionistic view

    Science.gov (United States)

    Kim, J.-H.; Kim, J.-S.

    2016-09-01

    The development of the ripple pattern during the ion beam sputtering (IBS) is expounded via the evolution of its constituent ripples. For that purpose, we perform numerical simulation of the ripple evolution that is based on Bradley-Harper model and its non-linear extension. The ripples are found to evolve via various well-defined processes such as ripening, averaging, bifurcation and their combinations, depending on their neighboring ripples. Those information on the growth kinetics of each ripple allow the detailed description of the pattern development in real space that the instability argument and the diffraction study both made in k-space cannot provide.

  4. Stannic oxide thin film growth via ion-beam-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Becker, Martin; Hamann, Robert; Polity, Angelika; Meyer, Bruno K.

    2014-02-28

    Stannic oxide (SnO{sub 2}) is of great technological interest as a member of the important family of oxide materials that combine low electrical resistance with high optical transparency in the visible range of the electromagnetic spectrum. Tin oxide thin films are grown on sapphire substrates by ion beam sputtering method with varying heater temperature from 100 to 750 °C at constant gas flux. Enhancement of crystallinity of thin films with temperature is observed from X-ray diffraction and Raman spectroscopy studies. Morphological studies by atomic force microscopy reveal changes in grain size with variation in substrate temperature. - Highlights: • Polycrystalline SnO{sub 2} thin films were grown on sapphire by ion beam sputtering. • Self-designed ion thrusters can be used as ion sources in material processing. • Precise control of heater temperature is crucial to attain transparent SnO{sub 2} films. • Higher heater temperature enhances film quality indicated by smaller FWHM in XRD.

  5. Controlled growth of few-layer hexagonal boron nitride on copper foils using ion beam sputtering deposition.

    Science.gov (United States)

    Wang, Haolin; Zhang, Xingwang; Meng, Junhua; Yin, Zhigang; Liu, Xin; Zhao, Yajuan; Zhang, Liuqi

    2015-04-01

    Ion beam sputtering deposition (IBSD) is used to synthesize high quality few-layer hexagonal boron nitride (h-BN) on copper foils. Compared to the conventional chemical vapor deposition, the IBSD technique avoids the use of unconventional precursors and is much easier to control, which should be very useful for the large-scale production of h-BN in the future.

  6. Oberst beam test technique

    Science.gov (United States)

    Fasana, Alessandro; Garibaldi, Luigi; Giorcelli, Ermanno; Ruzzene, Massimo

    1998-06-01

    The definition of the mechanical properties of viscoelastic materials, i.e. the elastic modulus and the loss factor, is carried out, according to many national and international standards, with many different techniques, both of the resonant and non-resonant type. In this paper we focus our attention on the pros and cons of the resonant technique based on the classical Oberst beam method. When the damping material to be tested is not self-supporting, its properties are determined taking start from the measured modal frequencies and loss factors of a laminated beam, constituted by one or two metallic strips, ideally undamped, and one or two viscoelastic layers. The formulae specified on the standards hold valid under the assumptions of the theory developed by Kerwin, Ungar and Ross and we try in this paper to quantify witch deviation of the results should be expected when moving away from their ideal hypotheses.

  7. A review of basic phenomena and techniques for sputter-deposition of high temperature superconducting films

    Energy Technology Data Exchange (ETDEWEB)

    Auciello, O. (Microelectronics Center of North Carolina, Research Triangle Park, NC (USA) North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Ameen, M.S.; Kingon, A.I.; Lichtenwalner, D.J. (North Carolina State Univ., Raleigh, NC (USA). Dept. of Materials Science and Engineering); Krauss, A.R. (Argonne National Lab., IL (USA))

    1990-01-01

    The processes involved in plasma and ion beam sputter-deposition of high temperature superconducting thin films are critically reviewed. Recent advances in the development of these techniques are discussed in relation to basic physical phenomena, specific to each technique, which must be understood before high quality films can be produced. Control of film composition is a major issue in sputter-deposition of multicomponent materials. Low temperature processing of films is a common goal for each technique, particularly in relation to integrating high temperature superconducting films with the current microelectronics technology. It has been understood for some time that for Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} deposition, the most intensely studied high-{Tc} compound, incorporation of sufficient oxygen into the film during deposition is necessary to produce as-deposited superconducting films at relatively substrate temperatures. Recent results have shown that with the use of suitable buffer layers, high quality Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} sputtered films can be obtained on Si substrates without the need for post-deposition anneal processing. This review is mainly focussed on issues related to sputter-deposition of Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub 7} thin films, although representative results concerning the bismuth and thallium based compounds are included. 143 refs., 11 figs.

  8. Beam Techniques - Beam Control and Manipulation

    Energy Technology Data Exchange (ETDEWEB)

    Minty, Michiko G

    2003-04-24

    We describe commonly used strategies for the control of charged particle beams and the manipulation of their properties. Emphasis is placed on relativistic beams in linear accelerators and storage rings. After a brief review of linear optics, we discuss basic and advanced beam control techniques, such as transverse and longitudinal lattice diagnostics, matching, orbit correction and steering, beam-based alignment, and linac emittance preservation. A variety of methods for the manipulation of particle beam properties are also presented, for instance, bunch length and energy compression, bunch rotation, changes to the damping partition number, and beam collimation. The different procedures are illustrated by examples from various accelerators. Special topics include injection and extraction methods, beam cooling, spin transport and polarization.

  9. Roles of secondary electrons and sputtered atoms in ion-beam-induced deposition

    NARCIS (Netherlands)

    Chen, P.; Salemink, H.W.M.; Alkemade, P.F.A.

    2009-01-01

    The authors report the results of investigating two models for ion-beam-induced deposition (IBID). These models describe IBID in terms of the impact of secondary electrons and of sputtered atoms, respectively. The yields of deposition, sputtering, and secondary electron emission, as well as the ener

  10. Effect of negative substrate bias on the microstructure and mechanical properties of Ti-Si-N films deposited by a hybrid filtered cathodic arc and ion beam sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Zhang Yujuan, E-mail: cnzhangyujuan@yahoo.com.cn [Laboratory of Special Functional Materials, Henan University, Kaifeng 475004 (China); Yang Yingze; Zhai Yuhao; Zhang Pingyu [Laboratory of Special Functional Materials, Henan University, Kaifeng 475004 (China)

    2012-07-01

    A hybrid cathodic arc and ion beam sputtering method was employed to synthesize Ti-Si-N films. The influence of negative substrate bias on the structure and mechanical properties was investigated by using XRD, XPS, HRTEM, nanoindentor and so on. With the increasing of negative bias there is a decrease in the TiN crystallite size from 36 nm to 10 nm. Negative substrate bias promoted the conformation of nc-TiN/a-Si{sub 3}N{sub 4} nanocomposite structure with complete phase separation and uniform crystallite size. Superhard TiSiN films with a maximum hardness of 46 GPa were successfully synthesized under 100 V negative bias. Severe oxidation occurred in films deposited under 200 V and 300 V negative substrate bias due to the decreasing of deposition rate, which led to the hardness of films reduced to the value of 26 GPa and 22 GPa respectively.

  11. Sputtering as a Technique for Applying Tribological Coatings

    Science.gov (United States)

    Ramalingam, S.

    1984-01-01

    Friction and wear-induced mechanical failures may be controlled to extend the life of tribological components through the interposition of selected solid materials between contacting surfaces. Thin solid films of soft and hard materials are appropriate to lower friction and enhance the wear resistance of precision tribo-elements. Tribological characteristics of thin hard coats deposited on a variety of ferrous and non-ferrous substrates were tested. The thin hard coats used were titanium nitride films deposited by reactive magnetron sputtering of metallic titanium. High contact stress, low speed tests showed wear rate reductions of one or more magnitude, even with films a few micrometers in thickness. Low contact stress, high speed tests carried out under rather severe test conditions showed that thin films of TiN afforded significant friction reduction and wear protection. Thin hard coats were shown to improve the friction and wear performance of rolling contacts. Satisfactory film-to-substrate adhesion strengths can be obtained with reactive magnetron sputtering. X-ray diffraction and microhardness tests were employed to assess the effectiveness of the sputtering technique.

  12. Development of hydrophobicity of mica surfaces by ion beam sputtering

    Science.gov (United States)

    Metya, Amaresh; Ghose, Debabrata; Ray, Nihar Ranjan

    2014-02-01

    The hydrophilic mica surface can be made hydrophobic by low energy Ar+ ion sputtering. The ion sputtering leads to both topographical and physicochemical changes of the surface which are thought to be responsible for the water repelling behavior. The sessile drop method is used to evaluate the wetting properties of the sputtered mica surfaces. It has been shown that the sputter-pattern at the nano-length scale has little influence on the development of hydrophobicity. On the other hand, the wettability appears to be strongly connected with the chemistry of the bombarded surface. We have also studied the temporal evolution of contact angle as the water evaporates due to difference in vapor pressures between the droplet surface and the surroundings. The analysis offers a simple method to estimate the diffusion coefficient of water vapor.

  13. Development of hydrophobicity of mica surfaces by ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Metya, Amaresh; Ghose, Debabrata, E-mail: debabrata.ghose@saha.ac.in; Ray, Nihar Ranjan

    2014-02-28

    The hydrophilic mica surface can be made hydrophobic by low energy Ar{sup +} ion sputtering. The ion sputtering leads to both topographical and physicochemical changes of the surface which are thought to be responsible for the water repelling behavior. The sessile drop method is used to evaluate the wetting properties of the sputtered mica surfaces. It has been shown that the sputter-pattern at the nano-length scale has little influence on the development of hydrophobicity. On the other hand, the wettability appears to be strongly connected with the chemistry of the bombarded surface. We have also studied the temporal evolution of contact angle as the water evaporates due to difference in vapor pressures between the droplet surface and the surroundings. The analysis offers a simple method to estimate the diffusion coefficient of water vapor.

  14. Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces

    Energy Technology Data Exchange (ETDEWEB)

    Corbella, Carles; Grosse-Kreul, Simon; Kreiter, Oliver; Arcos, Teresa de los; Benedikt, Jan; Keudell, Achim von [RD Plasmas with Complex Interactions, Ruhr-Universität Bochum, Universitätsstr. 150, 44780 Bochum (Germany)

    2013-10-15

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions in reactive sputtering applications. Atom and ion sources are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions, and metal vapor. The heterogeneous surface processes are monitored in situ by means of a quartz crystal microbalance and Fourier transform infrared spectroscopy. Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma pre-treatment of polymers (PET, PP)

  15. Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces.

    Science.gov (United States)

    Corbella, Carles; Grosse-Kreul, Simon; Kreiter, Oliver; de los Arcos, Teresa; Benedikt, Jan; von Keudell, Achim

    2013-10-01

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions in reactive sputtering applications. Atom and ion sources are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions, and metal vapor. The heterogeneous surface processes are monitored in situ by means of a quartz crystal microbalance and Fourier transform infrared spectroscopy. Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma pre-treatment of polymers (PET, PP).

  16. Synthesis of Electrical Conductive Silica Nanofiber/Gold Nanoparticle Composite by Laser Pulses and Sputtering Technique

    Science.gov (United States)

    Hamza, Sarah; Ignaszak, Anna; Kiani, Amirkianoosh

    2017-06-01

    Biocompatible-sensing materials hold an important role in biomedical applications where there is a need to translate biological responses into electrical signals. Increasing the biocompatibility of these sensing devices generally causes a reduction in the overall conductivity due to the processing techniques. Silicon is becoming a more feasible and available option for use in these applications due to its semiconductor properties and availability. When processed to be porous, it has shown promising biocompatibility; however, a reduction in its conductivity is caused by its oxidization. To overcome this, gold embedding through sputtering techniques are proposed in this research as a means of controlling and further imparting electrical properties to laser induced silicon oxide nanofibers. Single crystalline silicon wafers were laser processed using an Nd:YAG pulsed nanosecond laser system at different laser parameters before undergoing gold sputtering. Controlling the scanning parameters (e.g., smaller line spacings) was found to induce the formation of nanofibrous structures, whose diameters grew with increasing overlaps (number of laser beam scanning through the same path). At larger line spacings, nano and microparticle formation was observed. Overlap (OL) increases led to higher light absorbance's by the wafers. The gold sputtered samples resulted in greater conductivities at higher gold concentrations, especially in samples with smaller fiber sizes. Overall, these findings show promising results for the future of silicon as a semiconductor and a biocompatible material for its use and development in the improvement of sensing applications.

  17. Precise thin film synthesis by ion beam sputter deposition; Herstellung von Praezisionsschichten mittels Ionenstrahlsputtern

    Energy Technology Data Exchange (ETDEWEB)

    Gawlitza, P.; Braun, S.; Leson, A.; Lipfert, S. [Fraunhofer-Institut fuer Werkstoffphysik und Schichttechnologie (IWS), Dresden (Germany); Nestler, M. [Roth und Rau AG, Hohenstein-Ernstthal (Germany)

    2007-04-15

    Ion beam sputter deposition (IBSD) is a promising technique for the fabrication of high performance thin films because of the well defined and adjustable particle energies, which are rather high in comparison to other PVD techniques. Recent developments concerning long-term stability and lateral uniformity of the ion beam sources strengthen the position of the IBSD technique in the field of precise thin film synthesis. Furthermore, IBSD offers a more independent choice of relevant deposition parameters like particle energy and flux, process gas pressure and deposition rate. In this paper we present our currently installed large area IBSD facility 'IonSys 1600', which was developed by Fraunhofer IWS Dresden and Roth and Rau company (Hohenstein-Ernstthal). Substrate sizes of up to 200 mm (circular) or up to 500 mm length (rectangular) can be coated and multilayer stacks with up to six different materials are possible. Tailored 1- or 2- dimensional film thickness distribution with deviations of <0.1% can be fabricated by a relative linear motion of the substrate holder above an aperture. In order to demonstrate the advantages of the IBSD technique especially for sophisticated materials and films with high requirements concerning purity, chemical composition or growth structure, several examples of deposited multilayers for various applications are presented. (orig.)

  18. Peculiarities of temperature dependent ion beam sputtering and channeling of crystalline bismuth.

    Science.gov (United States)

    Langegger, Rupert; Hradil, Klaudia; Steiger-Thirsfeld, Andreas; Bertagnolli, Emmerich; Lugstein, Alois

    2014-08-01

    In this paper, we report on the surface evolution of focused ion beam treated single crystalline Bi(001) with respect to different beam incidence angles and channeling effects. 'Erosive' sputtering appears to be the dominant mechanism at room temperature (RT) and diffusion processes during sputtering seem to play only a minor role for the surface evolution of Bi. The sputtering yield of Bi(001) shows anomalous behavior when increasing the beam incidence angle along particular azimuthal angles of the specimen. The behavior of the sputtering yield could be related to channeling effects and the relevant channeling directions are identified. Dynamic annealing processes during ion irradiation retain the crystalline quality of the Bi specimen allowing ion channeling at RT. Lowering the specimen temperature to T = -188 °C reduces dynamic annealing processes and thereby disables channeling effects. Furthermore unexpected features are observed at normal beam incidence angle. Spike-like features appear during the ion beam induced erosion, whose growth directions are not determined by the ion beam but by the channeling directions of the Bi specimen.

  19. Ion beam sputter deposition of Ge films: Influence of process parameters on film properties

    Energy Technology Data Exchange (ETDEWEB)

    Bundesmann, C., E-mail: carsten.bundesmann@iom-leipzig.de [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Feder, R. [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Wunderlich, R.; Teschner, U.; Grundmann, M. [Universität Leipzig, Fakultät für Physik und Geowissenschaften, Institut für Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig (Germany); Neumann, H. [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany)

    2015-08-31

    Several sets of Ge films were grown by ion beam sputter deposition under systematic variation of ion beam parameters (ion species and ion energy) and geometrical parameters (ion incidence angle and polar emission angle). The films were characterized concerning thickness, growth rate, mass density, structural properties and composition. The film thicknesses show a cosine-like angular distribution, and the growth rates were found to increase with increasing ion incidence angle and ion energy. All films are amorphous and the average mass density was found to be (4.3 ± 0.2) g/cm{sup 3}, without a systematic relation to ion energy and geometrical parameters. Slightly higher mass densities were found for Ge films grown by sputtering with Xe than for sputtering with Ar. The Ge films contain a fraction of inert gas atoms from backscattered primary particles. This fraction is found to be higher for sputtering with Ar than for sputtering with Xe. The fraction of inert gas atoms increases with increasing polar emission angle and increasing ion incidence angle. Raman scattering experiments revealed also systematic shifts of the characteristic Raman mode. The shifts are tentatively assigned to the change of the Ge particle densities caused by the incorporation of inert gas particles. There seem to be also slight changes in short range ordering. The experimental data are discussed with respect to the known energy and angular distributions of the sputtered and backscattered particles. - Highlights: • Ion beam sputter deposition under systematic variation of process parameters • Thickness, growth rate, mass density, composition, structure, phonon properties • All germanium films are amorphous with small variations in mass density. • Incorporation of considerable amount of inert process gas • Vibrational properties correlate with composition.

  20. Biquadratic coupling in Co/Ir multilayers and sandwiches deposited by ion beam sputtering (IBS)

    Energy Technology Data Exchange (ETDEWEB)

    Colis, S. E-mail: colis@ipcms.u-strasbg.fr; Dinia, A.; Panissod, P.; Schmerber, G.; Meny, C

    2001-05-01

    We report on magnetic and transport properties of Co/Ir sandwiches and multilayers prepared by ion beam sputtering (IBS). The maximum GMR and coupling strength are about 2% and -0.55 erg/cm{sup 2}, respectively. This coupling is found to be homogeneous and to have a biquadratic nature instead of the antiferromagnetic one, usually observed.

  1. Structure and Magnetic Properties of Fe-N Films Prepared by Dual Ion Beam Sputtering

    Institute of Scientific and Technical Information of China (English)

    诸葛兰剑; 吴雪梅; 汤乃云; 叶春兰; 姚伟国

    2001-01-01

    Fe-N films were prepared on Si substrate by dual ion beam sputtering (DIBS). It is of the films were investigated by a vibrating sample magnetometer (VSM). The structure of the films is insensitive to the ratios of N2/Ar in main ion source(MIS), and is mainly influenced by the substrate temperature (Ts).``

  2. BN coatings deposition by magnetron sputtering of B and BN targets in electron beam generated plasma

    Science.gov (United States)

    Kamenetskikh, A. S.; Gavrilov, N. V.; Koryakova, O. V.; Cholakh, S. O.

    2017-05-01

    Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 µs for B; 13.56 MHz for BN) at 2-20 mA/cm2 ion current density on the substrate. The effect of electron beam generated plasma on characteristics of magnetron discharge and phase composition of coatings was studied.

  3. Obtaining and doping of InAs-QD/GaAs(001 nanostructures by ion beam sputtering

    Directory of Open Access Journals (Sweden)

    Sergei N. Chebotarev

    2017-01-01

    Full Text Available The features of InAs quantum dots obtained on GaAs(001 single-crystal substrates by ion-beam sputtering were investigated. It has been shown that in the range of ion energies of 150 to 200 eV at a temperature of 500 °C and a beam current of 120 µA InAs quantum dots with average dimensions below 15 nm and a surface density of 1011 cm−2 are formed. The technique of controlled doping of InAs/GaAs nanostructures using a SnTe solid-state source was proposed. It has been established that a maximum donor concentration of 8.7·1018 cm−3 in the GaAs spacer layer is reached at an evaporation temperature of 415 °С. At the same time, impurity accumulation in the growth direction was observed. We have shown that increasing the impurity doping of the GaAs barrier layer increases the intensity of photoluminescence peaks of the ground state and the first excited state of the InAs quantum dots.

  4. Optical Properties of Amorphous AlN Thin Films on Glass and Silicon Substrates Grown by Single Ion Beam Sputtering

    Science.gov (United States)

    Hajakbari, Fatemeh; Mojtahedzadeh Larijani, Majid; Ghoranneviss, Mahmood; Aslaninejad, Morteza; Hojabri, Alireza

    2010-09-01

    The structural and optical properties of aluminum nitride (AlN) films deposited on glass and silicon substrates by single ion beam sputtering technique have been investigated. The X-ray diffraction and Fourier transform infrared spectroscopy (FTIR) study revealed the formation of the amorphous phase of AlN. The optical characteristics of films, such as refractive index, extinction coefficient, and average thickness, were calculated by Swanepoel's method using transmittance measurements. The refractive index and average roughness values of the films increased with film thickness. Moreover, it was found that thickness augmentation leads to a decrease in optical band gap energy calculated using Tauc's relation.

  5. Laser beam shaping theory and techniques

    CERN Document Server

    Dickey, Fred M

    2000-01-01

    The mathematical and physical theory of lossless beam shaping; Gaussian beam shaping - diffraction theory and design; geometrical methods; optimization-based techniques for laser shaping optics; beam shaping with diffractive diffusers; multi-aperture beam integration systems; classical (non-laser) methods; current technology of beam profile measurements.

  6. Investigation of surface characteristics evolution and laser damage performance of fused silica during ion-beam sputtering

    Science.gov (United States)

    Xu, Mingjin; Dai, Yifan; Zhou, Lin; Shi, Feng; Wan, Wen; Xie, Xuhui; Sui, Tingting

    2016-08-01

    Surface characteristics have great influence on the optical properties especially the laser radiation resistivity of optics. In this paper, the surface characteristics evolutions of fused silica during ion-beam sputtering and their effects on the laser damage performance were investigated. The results show that roughness change is strongly removal depth dependent and a super-smooth surface (0.25 nm RMS) can be obtained by the ion-induced smoothing effect. The concentration of metal impurities (especially Ce element) in subsurface can be effectively decreased after the removal of polishing re-deposition layer. During ion-beam sputtering process, the plastic scratches can be removed while the brittle cracks can be broadened and passivated without increase in the depth direction. Laser damage threshold of fused silica improved by 36% after ion-beam sputtering treatment. Research results have a guiding significance for ion-beam sputtering process technology of fused silica optics.

  7. Nano-sized Thin Films Fabricated by Ion Beam Sputtering and Its Properties

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorphous to crystalline state. The film thickness was measured with α-stylus surface profiler, the structure and the compositions of the films were confirmed by low angle X-ray diffraction and scanning auger electron microprobe respectively, and the surface topography was characterized by scanning electron microscope and scanning probe microscope. Electrical property of the films was measured by fourpoint probe. The experimental results illustrate that the combined processes of ion beam sputtering and rapid thermal process are effective for fabrication nanoscale Ni-Cr alloy thin film with good properties.

  8. Arbitrarily shaped Si nanostructures by glancing angle ion beam sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Patzig, Christian; Miessler, Andre [Leibniz-Institut fuer Oberflaechenmodifizierung e.V. (IOM), Permoserstrasse 15, 04318 Leipzig (Germany); Karabacak, Tansel [University of Arkansas at Little Rock, 2801 South University Avenue, Little Rock, AR 72204 (United States); Rauschenbach, Bernd [Leibniz-Institut fuer Oberflaechenmodifizierung e.V. (IOM), Permoserstrasse 15, 04318 Leipzig (Germany); Universitaet Leipzig, Institut fuer Experimentalphysik II, Linnestrasse 5, 04103 Leipzig (Germany)

    2010-06-15

    Using glancing angle deposition by ion beam sputtering, sculptured thin films (STFs) consisting of various Si nanostructures of manyfold shapes, such as inclined and vertical columns, screws, and spirals, were deposited on Si substrates. It will be shown that morphology, shape, and diameter of the structures are influenced and can thus be controlled by adjusting various deposition parameters, including substrate temperature and ratio of substrate rotational speed to film deposition rate. Especially the temperature-controlled surface diffusion is found to play an important role in the growth of STFs. Cross-sectional scanning electron microscopy micrograph of helical Si nanostructures, deposited with ion beam sputter glancing angle deposition. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  9. Nanoscale pattern formation at surfaces under ion-beam sputtering: A perspective from continuum models

    Energy Technology Data Exchange (ETDEWEB)

    Cuerno, Rodolfo, E-mail: cuerno@math.uc3m.e [Departamento de Matematicas and Grupo Interdisciplinar de Sistemas Complejos (GISC), Universidad Carlos III de Madrid, Avenida de la Universidad 30, E-28911 Leganes, Madrid (Spain); Castro, Mario [GISC and Grupo de Dinamica No Lineal (DNL), Escuela Tecnica Superior de Ingenieria (ICAI), Universidad Pontificia Comillas, E-28015 Madrid (Spain); Munoz-Garcia, Javier [Systems Biology Ireland and GISC, University College Dublin, Belfield, Dublin 4 (Ireland); Gago, Raul; Vazquez, Luis [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cientificas, E-28049 Madrid (Spain)

    2011-05-01

    Although reports on surface nanostructuring of solid targets by low to medium energy ion irradiation date back to the 1960s, only with the advent of high resolution tools for surface/interface characterization has the high potential of this procedure been recognized as a method for efficient production of surface patterns. Such morphologies are made up of periodic arrangements of nanometric sized features, like ripples and dots, with interest for technological applications due to their electronic, magnetic, and optical properties. Thus, roughly for the last ten years large efforts have been directed towards harnessing this nanofabrication technique. However, and particularly in view of recent experimental developments, we can say that the basic mechanisms controlling these pattern formation processes remain poorly understood. The lack of nanostructuring at low angles of incidence on some pure monoelemental targets, the role of impurities in the surface dynamics and other recent observations are challenging the classic view on the phenomenon as the mere interplay between the curvature dependence of the sputtering yield and surface diffusion. We review the main attempts at a theoretical (continuum) description of these systems, with emphasis on recent developments. Strong hints already exist that the nature of the morphological instability has to be rethought as originating in the material flow that is induced by the ion beam.

  10. Giant Positive Magnetoresistance in Magnetic Multilayer Film Prepared by Ion-Beam Sputtering

    Institute of Scientific and Technical Information of China (English)

    张栋杰; 都有为

    2003-01-01

    The magnetic multilayers Ni78Co22∥Cu∥Ni78Co22/Ni78Co22O∥Ta were fabricated by ion-beam sputtering through applied magnetic field and treatment under high vacuum. Resistance against applied magnetic field was measured by the standard four-point probe method at room temperature. The giant positive magnetoresistance has been observed. A maximum positive magnetoresistance at room temperature was obtained to be 280%.

  11. Detailed subsurface damage measurement and efficient damage-free fabrication of fused silica optics assisted by ion beam sputtering.

    Science.gov (United States)

    Liao, Wenlin; Dai, Yifan; Liu, Zongzheng; Xie, Xuhui; Nie, Xuqing; Xu, Mingjin

    2016-02-22

    Formation of subsurface damage has an inseparable relationship with microscopic material behaviors. In this work, our research results indicate that the formation process of subsurface damage often accompanies with the local densification effect of fused silica material, which seriously influences microscopic material properties. Interestingly, we find ion beam sputtering (IBS) is very sensitive to the local densification, and this microscopic phenomenon makes IBS as a promising technique for the detection of nanoscale subsurface damages. Additionally, to control the densification effect and subsurface damage during the fabrication of high-performance optical components, a combined polishing technology integrating chemical-mechanical polishing (CMP) and ion beam figuring (IBF) is proposed. With this combined technology, fused silica without subsurface damage is obtained through the final experimental investigation, which demonstrates the feasibility of our proposed method.

  12. Effect of annealing on the optical properties of the ion beam sputtered NiO thin film

    Science.gov (United States)

    Chouhan, Romita; Baraskar, Priyanka; Dar, Tanveer A.; Agrawal, Arpana; Gupta, Mukul; Sen, Pranay K.; Sen, Pratima.

    2017-05-01

    Effect of annealing on optical characteristics of Nickel oxide thin films deposited by ion beam sputtering technique from a Ni target in a mixture of oxygen and argon gas on to a glass substrate has been studied. The deposited films were characterized in as deposited state(S1) and after annealing(S2) at temp of 523 K. Crystalline properties of films were investigated using X-ray diffraction technique from which we found that both S1 and S2 shows the polycrystalline nature with preferential growth along (111) plane. The transmittance of the S2 films was decreased. The surface morphology of the film was studied using atomic force microscopy (AFM). The nonlinear optical properties of the films were obtained using z-scan technique which reveals that the nonlinear absorption coefficient of S2 films is larger than that of S1 samples. Improved nonlinearity suggests the utility of the grown films for optoelectronic device application.

  13. Systematic investigations of low energy Ar ion beam sputtering of Si and Ag

    Energy Technology Data Exchange (ETDEWEB)

    Feder, R., E-mail: rene.feder@iom-leipzig.de [Leibniz-Institut für Oberflächenmodifizierung, Permoserstraße 15, 04318 Leipzig (Germany); Frost, F.; Neumann, H.; Bundesmann, C.; Rauschenbach, B. [Leibniz-Institut für Oberflächenmodifizierung, Permoserstraße 15, 04318 Leipzig (Germany)

    2013-12-15

    Ion beam sputter deposition (IBD) delivers some intrinsic features influencing the growing film properties, because ion properties and geometrical process conditions generate different energy and spatial distributions of the sputtered and scattered particles. Even though IBD has been used for decades, the full capabilities are not investigated systematically and specifically used yet. Therefore, a systematic and comprehensive analysis of the correlation between the properties of the ion beam, the generated secondary particles and backscattered ions and the deposited films needs to be done. A vacuum deposition chamber has been set up which allows ion beam sputtering of different targets under variation of geometrical parameters (ion incidence angle, position of substrates and analytics in respect to the target) and of ion beam parameters (ion species, ion energy) to perform a systematic and comprehensive analysis of the correlation between the properties of the ion beam, the properties of the sputtered and scattered particles, and the properties of the deposited films. A set of samples was prepared and characterized with respect to selected film properties, such as thickness and surface topography. The experiments indicate a systematic influence of the deposition parameters on the film properties as hypothesized before. Because of this influence, the energy distribution of secondary particles was measured using an energy-selective mass spectrometer. Among others, experiments revealed a high-energetic maximum for backscattered primary ions, which shifts with increasing emission angle to higher energies. Experimental data are compared with Monte Carlo simulations done with the well-known Transport and Range of Ions in Matter, Sputtering version (TRIM.SP) code [J.P. Biersack, W. Eckstein, Appl. Phys. A: Mater. Sci. Process. 34 (1984) 73]. The thicknesses of the films are in good agreement with those calculated from simulated particle fluxes. For the positions of the

  14. Characteristics of submicron patterns fabricated by gallium focused-ion-beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Morimoto, H.; Sasaki, Y.; Watakabe, Y.; Kato, T.

    1985-01-01

    Cross sections of the patterns fabricated in (100) GaAs by 100-keV gallium focused ion beam have been studied using a scanning electron microscope (SEM). The probe size of the ion beam is 0.1--0.15 ..mu..m at the current of 100 pA. The etched depth becomes saturated at the high dose region (about 5.0 x 10/sup -6/ C/cm) because of the redeposition effect. The pattern profile becomes asymmetric if it is made up of several adjacent lines perpendicular to the beam scanning direction due to the redeposition effect and the increase of sputtering yield for each scan, which is caused by the change of ion beam incident angle. These effects can be eliminated by the use of multiwriting method.

  15. Optical Properties of dual ion beam sputtered Indium Tin Oxide films on glass and Silicon

    Science.gov (United States)

    Simpson, Nelson; Geerts, Wilhelmus; Bandyopadhyay, Anup

    2012-03-01

    Indium Tin Oxide (ITO) is a transparent conducting material that finds application in flat panel displays, solar cells, and photodetectors. High quality ITO films, i.e. films with a large transparency and a high conductivity, are normally deposited above room temperature often at 300-400 C. This high deposition temperature eliminates most plastics as substrates. To lower the substrate deposition temperature we are applying atomic instead of molecular oxygen during the sputtering process. A dual ion beam sputtering system (DIBS) has been modified to allow the substrate to be exposed to an atomic oxygen beam at 45 degrees angle of incidence. Thin films were sputtered as a function of atomic oxygen flux and substrate temperature on glass, silicon, and sapphire substrates. The optical properties were measured by spectroscopic ellipsometry, reflectometry, and FTIR. Film thickness and bandgap were determined from the optical properties in the visible part of the spectrum. Mobility was determined from the infrared part of the spectruam. Optical properties appear to vary with the film thickness, the oxygen flux, and the substrate temperature. Roughness of the samples was independently measured by AFM. This work is supported by a grant from research corporation (10775).

  16. Transparent aluminium nanowire electrodes with optical and electrical anisotropic response fabricated by defocused ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Repetto, Diego, E-mail: diegorepet@gmail.com; Giordano, Maria Caterina, E-mail: marinagiordano88@gmail.com; Martella, Christian, E-mail: christian.martella@gmail.com; Buatier de Mongeot, Francesco, E-mail: buatier@fisica.unige.it

    2015-02-01

    Highlights: • Self-organized Al nanowires were grown on glass substrates by ion beam sputtering. • Al nanowire pattern exhibit electrical and optical anisotropy. • Al NW pattern can be used as transparent electrodes for optoelectronic devices. - Abstract: Self-organized Al nanowire (NW) electrodes have been obtained by defocused Ion Beam Sputtering (IBS) of polycrystalline Al films grown by sputter deposition. The electrical sheet resistance of the electrode has been acquired in situ during ion bombardment of the samples, evidencing an increase of the electronic transport anisotropy as a function of ion fluence between the two directions parallel and orthogonal to the NWs axis. Optical spectra in transmission also show a large dichroism between the two directions, suggesting the role of localized plasmons in the UV spectral range. The results show that Al NW electrodes, prepared under experimental conditions which are compatible with those of conventional industrial coaters and implanters, could represent a low cost alternative to the transparent conductive oxides employed in optoelectronic devices.

  17. Nanocrystalline magnetite thin films grown by dual ion-beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Prieto, Pilar, E-mail: pilar.prieto@uam.es [Departamento de Física Aplicada M-12, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Ruiz, Patricia [Departamento de Física Aplicada M-12, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Ferrer, Isabel J. [Departamento de Física de Materiales M-4, Universidad Autónoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Figuera, Juan de la; Marco, José F. [Instituto de Química Física “Rocasolano”, CSIC, Serrano 119, 28006 Madrid (Spain)

    2015-07-05

    Highlights: • We have grown tensile and compressive strained nanocrystalline magnetite thin films by dual ion beam sputtering. • The magnetic and thermoelectric properties can be controlled by the deposition conditions. • The magnetic anisotropy depends on the crystalline grain size. • The thermoelectric properties depend on the type of strain induced in the films. • In plane uniaxial magnetic anisotropy develops in magnetite thin films with grain sizes ⩽20 nm. - Abstract: We have explored the influence of an ion-assisted beam in the thermoelectric and magnetic properties of nanocrystalline magnetite thin films grown by ion-beam sputtering. The microstructure has been investigated by XRD. Tensile and compressive strained thin films have been obtained as a function of the parameters of the ion-assisted beam. The evolution of the in-plane magnetic anisotropy was attributed to crystalline grain size. In some films, magneto-optical Kerr effect measurements reveal the existence of uniaxial magnetic anisotropy induced by the deposition process related with a small grain size (⩽20 nm). Isotropic magnetic properties have observed in nanocrystalline magnetite thin film having larger grain sizes. The largest power factor of all the films prepared (0.47 μW/K{sup 2} cm), obtained from a Seebeck coefficient of −80 μV/K and an electrical resistivity of 13 mΩ cm, is obtained in a nanocrystalline magnetite thin film with an expanded out-of-plane lattice and with a grain size ≈30 nm.

  18. Density behaviors of Ge nanodots self-assembled by ion beam sputtering deposition

    Institute of Scientific and Technical Information of China (English)

    Xiong Fei; Yang Tao; Song Zhao-Ning; Yang Pei-Zhi

    2013-01-01

    Self-assembled Ge nanodots with areal number density up to 2.33 × 1010 cm-2 and aspect ratio larger than 0.12 are prepared by ion beam sputtering deposition.The dot density,a function of deposition rate and Ge coverage,is observed to be limited mainly by the transformation from two-dimensional precursors to three-dimensional islands,and to be associated with the adatom behaviors of attachment and detachment from the islands.An unusual increasing temperature dependence of nanodot density is also revealed when a high ion energy is employed in sputtering deposition,and is shown to be related to the breaking down of the superstrained wetting layer.This result is attributed to the interaction between energetic atoms and the growth surface,which mediates the island nucleation.

  19. Structural analysis of the outermost hair surface using TOF-SIMS with gas cluster ion beam sputtering.

    Science.gov (United States)

    Lshikawa, Kazutaka; Okamoto, Masayuki; Aoyagi, Satoka

    2016-06-28

    A hair cuticle, which consists of flat overlapping scales that surround the hair fiber, protects inner tissues against external stimuli. The outermost surface of the cuticle is covered with a thin membrane containing proteins and lipids called the epicuticle. In a previous study, the authors conducted a depth profile analysis of a hair cuticle's amino acid composition to characterize its multilayer structure. Time-of-flight secondary ion mass spectrometry with a bismuth primary ion source was used in combination with the C60 sputtering technique for the analysis. It was confirmed that the lipids and cysteine-rich layer exist on the outermost cuticle surface, which is considered to be the epicuticle, though the detailed structure of the epicuticle has not been clarified. In this study, depth profile analysis of the cuticle surface was conducted using the argon gas cluster ion beam (Ar-GCIB) sputtering technique, in order to characterize the structure of the epicuticle. The shallow depth profile of the cuticle surface was investigated using an Ar-GCIB impact energy of 5 keV. Compared to the other amino acid peaks rich in the epicuticle, the decay of 18-methyleicosanic acid (18-MEA) thiolate peak was the fastest. This result suggests that the outermost surface of the hair is rich in 18-MEA. In conclusion, our results indicate that the outermost surfaces of cuticles have a multilayer (lipid and protein layers), which is consistent with the previously proposed structure.

  20. Microstructural Comparisons of Ultra-Thin Cu Films Deposited by Ion-Beam and dc-Magnetron Sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Prater, W.

    2004-11-04

    We report and contrast both the electrical resistance and the microstructure of copper thin films deposited in an oxygen containing atmosphere by ion-beam and dc-magnetron sputtering. For films with thicknesses 5 nm or less, the resistivity of the Cu films is minimized at oxygen concentrations ranging from 0.2% to 1% for dc-magnetron sputtering and 6% to 10% for ion beam sputtering. Films sputtered under both conditions show a similar decrease of interface roughness with increasing oxygen concentration, although the magnetron deposited films are smoother. The dc-magnetron produced films have higher resistivity, have smaller Cu grains, and contain a higher concentration of cuprous oxide particles. We discuss the mechanisms leading to the grain refinement and the consequent reduced resistivity in both types of films.

  1. Physical processes in directed ion beam sputtering. Ph.D. Thesis

    Science.gov (United States)

    Robinson, R. S.

    1979-01-01

    The general operation of a discharge chamber for the production of ions is described. A model is presented for the magnetic containment of both primary and secondary or Maxwellian electrons in the discharge plasma. Cross sections were calculated for energy and momentum transfer in binary collisions between like pairs of Ar, Kr, and Xe atoms in the energy range from about 1 eV to 1000 eV. These calculations were made from available pair interaction potentials using a classical model. Experimental data from the literature were fit to a theoretical expression for the Ar resonance charge exchange cross section over the same energy range. A model was developed that describes the processes of conical texturing of a surface due to simultaneous directed ion beam etching and sputter deposition of an impurity material. This model accurately predicts both a minimum temperature for texturing to take place and the variation of cone density with temperature. It also provides the correct order of magnitude of cone separation. It was predicted from the model, and subsequently verified experimentally, that a high sputter yield material could serve as a seed for coning of a lower sputter yield substrate. Seeding geometries and seed deposition rates were studied to obtain an important input to the theoretical texturing model.

  2. The ion beam sputtering facility at KURRI: Coatings for advanced neutron optical devices

    Energy Technology Data Exchange (ETDEWEB)

    Hino, Masahiro, E-mail: hino@rri.kyoto-u.ac.jp [Research Reactor Institute, Kyoto university, Kumatori, Osaka 590-0494 (Japan); Oda, Tatsuro [Department of Nuclear Engineering, Kyoto University, Kyoto 615-8540 (Japan); Kitaguchi, Masaaki [Center for Experimental Studies, KMI, Nagoya University, Nagoya 464-8602 (Japan); Yamada, Norifumi L. [Neutron Science Laboratory, High Energy Accelerator Research Organization, 203-1 Shirakata, Tokai, Ibaraki 319-1106 (Japan); Tasaki, Seiji [Department of Nuclear Engineering, Kyoto University, Kyoto 615-8540 (Japan); Kawabata, Yuji [Research Reactor Institute, Kyoto university, Kumatori, Osaka 590-0494 (Japan)

    2015-10-11

    We describe a film coating facility for the development of multilayer mirrors for use in neutron optical devices that handle slow neutron beams. Recently, we succeeded in fabricating a large neutron supermirror with high reflectivity using an ion beam sputtering system (KUR-IBS), as well as all neutron supermirrors in two neutron guide tubes at BL06 at J-PARC/MLF. We also realized a large flexible self-standing m=5 NiC/Ti supermirror and very small d-spacing (d=1.65 nm) multilayer sheets. In this paper, we present an overview of the performance and utility of non-magnetic neutron multilayer mirrors fabricated with the KUR-IBS.

  3. Bismuth coatings deposited by the pulsed dc sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Ortiz, M. F.; Olaya, J. J.; Alfonso, J. E., E-mail: jealfonsoo@unal.edu.co [Universidad Nacional de Colombia, Departamento de Fisica, Grupo de Ciencia de Materiales y Superficies, Carrera 45 No. 26-85, Edif. Uriel Gutierrez, Bogota D. C. (Colombia)

    2013-08-01

    In this work we present the results obtained from the deposition of nano-structured bismuth coatings through Dc pulsed unbalanced magnetron sputtering. The coatings were grown on two substrates: silicon and AISI steel 316 L. The microstructure of the Bi coatings grown on silicon and the corrosion resistance of the Bi coatings grown on AISI steel were evaluated. The microstructure was evaluated by X-ray diffraction and the corrosion resistance was characterized by means of polarization potentiodynamic and electrochemical impedance spectroscopy. Finally the morphology of the coatings was evaluated through scanning electronic microscopy. The X-ray diffraction analysis indicates that the coatings are polycrystalline; the corrosion resistance tests indicate that the films with better corrosion resistance were deposited at 40 khz. Scanning electron microscopy micrographs show that the coatings are grown as granular form. (Author)

  4. Techniques to sort Bessel beams

    CSIR Research Space (South Africa)

    Dudley, Angela L

    2013-09-01

    Full Text Available -polar coordinate transformation, translating helically phased beams into a transverse phase gradient. By introducing two cylindrical lenses we can focus each of the azimuthal modes associated with each Bessel beam to a different lateral position in the Fourier...

  5. Synthesis of silicon carbide films by combined implantation with sputtering techniques

    Science.gov (United States)

    Li, Gaobao; Zhang, Jizhong; Meng, Qingli; Li, Wenzhi

    2007-08-01

    Silicon carbide (SiC) films were synthesized by combined metal vapor vacuum arc (MEVVA) ion implantation with ion beam assisted deposition (IBAD) techniques. Carbon ions with 40 keV energy were implanted into Si(1 0 0) substrates at ion fluence of 5 × 10 16 ions/cm 2. Then silicon and carbon atoms were co-sputtered on the Si(1 0 0) substrate surface, at the same time the samples underwent assistant Ar-ion irradiation at 20 keV energy. A group of samples with substrate temperatures ranging from 400 to 600 °C were used to analyze the effect of temperature on formation of the SiC film. Influence of the assistant Ar-ion irradiation was also investigated. The structure, morphology and mechanical properties of the deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and nanoindentation, respectively. The bond configurations were obtained from IR absorption and Raman spectroscopy. The experimental results indicate that microcrystalline SiC films were synthesized at 600 °C. The substrate temperature and assistant Ar-ion irradiation played a key role in the process. The assistant Ar-ion irradiation also helps increasing the nanohardness and bulk modulus of the SiC films. The best values of nanohardness and bulk modulus were 24.1 and 282.6 GPa, respectively.

  6. Synthesis of silicon carbide films by combined implantation with sputtering techniques

    Energy Technology Data Exchange (ETDEWEB)

    Li Gaobao [Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China); Zhang Jizhong [Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China); International Centre for Materials Physics, Chinese Academy of Sciences, Shenyang 110016 (China); State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China)], E-mail: zjz@mail.tsinghua.edu.cn; Meng Qingli [Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China); Li Wenzhi [Laboratory of Advanced Materials, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China); State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 (China)

    2007-08-15

    Silicon carbide (SiC) films were synthesized by combined metal vapor vacuum arc (MEVVA) ion implantation with ion beam assisted deposition (IBAD) techniques. Carbon ions with 40 keV energy were implanted into Si(1 0 0) substrates at ion fluence of 5 x 10{sup 16} ions/cm{sup 2}. Then silicon and carbon atoms were co-sputtered on the Si(1 0 0) substrate surface, at the same time the samples underwent assistant Ar-ion irradiation at 20 keV energy. A group of samples with substrate temperatures ranging from 400 to 600 deg. C were used to analyze the effect of temperature on formation of the SiC film. Influence of the assistant Ar-ion irradiation was also investigated. The structure, morphology and mechanical properties of the deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and nanoindentation, respectively. The bond configurations were obtained from IR absorption and Raman spectroscopy. The experimental results indicate that microcrystalline SiC films were synthesized at 600 deg. C. The substrate temperature and assistant Ar-ion irradiation played a key role in the process. The assistant Ar-ion irradiation also helps increasing the nanohardness and bulk modulus of the SiC films. The best values of nanohardness and bulk modulus were 24.1 and 282.6 GPa, respectively.

  7. Ion beam sputter deposition of Ag films: Influence of process parameters on electrical and optical properties, and average grain sizes

    Energy Technology Data Exchange (ETDEWEB)

    Bundesmann, C., E-mail: carsten.bundesmann@iom-leipzig.de; Feder, R.; Gerlach, J.W.; Neumann, H.

    2014-01-31

    Ion beam sputter deposition is used to grow several sets of Ag films under systematic variation of ion beam parameters, such as ion species and ion energy, and geometrical parameters, such as ion incidence angle and polar emission angle. The films are characterized concerning their thickness by profilometry, their electrical properties by 4-point-probe-measurements, their optical properties by spectroscopic ellipsometry, and their average grain sizes by X-ray diffraction. Systematic influences of the growth parameters on film properties are revealed. The film thicknesses show a cosine-like angular distribution. The electrical resistivity increases for all sets with increasing emission angle and is found to be considerably smaller for Ag films grown by sputtering with Xe ions than for the Ag films grown by sputtering with Ar ions. Increasing the ion energy or the ion incidence angle also increases the electrical resistivity. The optical properties, which are the result of free charge carrier absorption, follow the same trends. The observed trends can be partly assigned to changes in the average grain size, which are tentatively attributed to different energetic and angular distributions of the sputtered and back-scattered particles. - Highlights: • Ion beam sputter deposition under systematic variation of process parameters. • Film characterization: thickness, electrical, optical and structural properties. • Electrical resistivity changes considerably with ion species and polar emission angle. • Electrical and optical data reveal a strong correlation with grain sizes. • Change of film properties related to changing properties of film-forming particles.

  8. Thin Film Formation of Gallium Nitride Using Plasma-Sputter Deposition Technique

    Directory of Open Access Journals (Sweden)

    R. Flauta

    2003-06-01

    Full Text Available The formation of gallium nitride (GaN thin film using plasma-sputter deposition technique has beenconfirmed. The GaN film deposited on a glass substrate at an optimum plasma condition has shown x-raydiffraction (XRD peaks at angles corresponding to that of (002 and (101 reflections of GaN. The remainingmaterial on the sputtering target exhibited XRD reflections corresponding to that of bulk GaN powder. Toimprove the system’s base pressure, a new UHV compatible system is being developed to minimize theimpurities in residual gases during deposition. The sputtering target configuration was altered to allow themonitoring of target temperature using a molybdenum (Mo holder, which is more stable against Gaamalgam formation than stainless steel.

  9. Structural and optical properties of CdO thin films deposited by RF magnetron sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Kumar, G. Anil, E-mail: anilhcu@gmail.com; Reddy, M. V. Ramana, E-mail: anilhcu@gmail.com [Department of Physics, Osmania University, Hyderabad-500007 (India); Reddy, Katta Narasimha, E-mail: anilhcu@gmail.com [Department of Physics, Mahatma Gandhi University, Nalgonda-508003 (India)

    2014-04-24

    Cadmium oxide (CdO) thin films were deposited on glass substrate by r.f. magnetron sputtering technique using a high purity (99.99%) Cd target of 2-inch diameter and 3 mm thickness in an Argon and oxygen mixed atmosphere with sputtering power of 50W and sputtering pressure of 2×10{sup −2} mbar. The prepared films were characterized by X-ray diffraction (XRD), optical spectroscopy and scanning electron microscopy (SEM). The XRD analysis reveals that the films were polycrystalline with cubic structure. The visible range transmittance was found to be over 70%. The optical band gap increased from 2.7 eV to2.84 eV with decrease of film thickness.

  10. Innovative sputtering techniques for CIS and CdTe submodule fabrication

    Energy Technology Data Exchange (ETDEWEB)

    Armstrong, J.M.; Misra, M.S.; Lanning, B. (Martin Marietta Aerospace, Denver, CO (United States). Astronautics Group)

    1993-03-01

    This report describes work done during Phase 1 of the subject subcontract. The subcontract was designed to study innovative deposition techniques, such as the rotating cylindrical magnetron sputtering system and electrodeposition for large-area, low-cost copper indium diselenide (CIS) and cadmium telluride (CdTe) devices. A key issue for photovoltaics (PV) in terrestrial and future space applications is producibility, particularly for applications using a large quantity of PV. Among the concerns for fabrication of polycrystalline thin-film PV, such as CIS and CdTe, are production volume, cost, and minimization of waste. Both rotating cylindrical magnetron (C-Mag[trademark]) sputtering and electrodeposition have tremendous potential for the fabrication of polycrystalline thin-film PV due to scaleability, efficient utilization of source materials, and inherently higher deposition rates. In the case of sputtering, the unique geometry of the C-Mae facilitates innovative cosputtering and reactive sputtering that could lead to greater throughput reduced health and safety risks, and, ultimately, lower fabrication cost. Electrodeposited films appear to be adherent and comparable with low-cost fabrication techniques. Phase I involved the initial film and device fabrication using the two techniques mentioned herein. Devices were tested by both internal facilities, as well as NREL and ISET.

  11. Particle beam experiments for the investigation of plasma-surface interactions: application to magnetron sputtering and polymer treatment

    CERN Document Server

    Corbella, Carles; Kreiter, Oliver; Arcos, Teresa de los; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions. Atom and ion beams are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions and metal vapor. The heterogeneous surface processes are monitored in-situ and in real time by means of a quartz crystal microbalance (QCM) and Fourier transform infrared spectroscopy (FTIR). Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma treatment of polymers (PET, PP).

  12. Ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles

    Science.gov (United States)

    Lautenschläger, T.; Feder, R.; Neumann, H.; Rice, C.; Schubert, M.; Bundesmann, C.

    2016-10-01

    In the present study, the influence of ion energy and geometrical parameters onto the angular and energy distribution of secondary particles for sputtering a Ti target with Ar ions is investigated. The angular distribution of the particle flux of the sputtered Ti atoms was determined by the collection method, i.e. by growing Ti films and measuring their thickness. The formal description of the particle flux can be realized by dividing it into an isotropic and an anisotropic part. The experimental data show that increasing the ion energy or decreasing the ion incidence angle lead to an increase of the isotropic part, which is in good agreement with basic sputtering theory. The energy distribution of the secondary ions was measured using an energy-selective mass spectrometer. The energy distribution of the sputtered target ions shows a maximum at an energy between 10 eV and 20 eV followed by a decay proportional to E-n, which is in principle in accordance with Thompson's theory, followed by a high energetic tail. When the sum of incidence angle and emission angle is increased, the high-energetic tail expands to higher energies and an additional peak due to direct sputtering events may occur. In the case of backscattered primary Ar ions, a maximum at an energy between 5 eV and 10 eV appears and, depending on the scattering geometry, an additional broad peak at a higher energy due to direct scattering events is observed. The center energy of the additional structure shifts systematically to higher energies with decreasing scattering angle or increasing ion energy. The experimental results are compared to calculations based on simple elastic two-particle-interaction theory and to simulations done with the Monte Carlo code SDTrimSP. Both confirm in principle the experimental findings.

  13. The influence of precursor films on CIGS films prepared by ion beam sputtering deposition

    Science.gov (United States)

    Zhao, Jun; Fan, Ping; Liang, Guangxing; Zheng, Zhuanghao; Zhang, Dongping; Chen, Chaoming

    2013-12-01

    The CuInGa(CIG) precursor films were grown by ion beam sputtering continuously CuGa/CuIn and CuIn/CuGa, and then selenized CIG to fabricate CIGS absorber films on molybdenum substrates . They were annealed in the same vacuum chamber and under the same temperature (500°C). The CIGS thin films were characterized with X-ray diffraction (XRD), Energy dispersive spectroscopy (EDS) and scanning electron microscopy (SEM) in order to study the microstructures, composition, surface morphology, electrical properties, respectively. The results showed that the CIGS thin films appeared smooth and compact with a sequence of Mo/CuGa/CuIn/Se, which were mainly of chalcopyrite structure. The CIGS thin films got the strongest diffraction peak intensity and were with good crystalline quality.

  14. Scanning-electron-microscopy observations and mechanical characteristics of ion-beam-sputtered surgical implant alloys

    Science.gov (United States)

    Weigand, A. J.; Meyer, M. L.; Ling, J. S.

    1977-01-01

    An electron bombardment ion thruster was used as an ion source to sputter the surfaces of orthopedic prosthetic metals. Scanning electron microscopy photomicrographs were made of each ion beam textured surface. The effect of ion texturing an implant surface on its bond to bone cement was investigated. A Co-Cr-W alloy and surgical stainless steel were used as representative hard tissue implant materials to determine effects of ion texturing on bulk mechanical properties. Work was done to determine the effect of substrate temperature on the development of an ion textured surface microstructure. Results indicate that the ultimate strength of the bulk materials is unchanged by ion texturing and that the microstructure will develop more rapidly if the substrate is heated prior to ion texturing.

  15. Control of surface ripple amplitude in ion beam sputtered polycrystalline cobalt films

    Energy Technology Data Exchange (ETDEWEB)

    Colino, Jose M., E-mail: josemiguel.colino@uclm.es [Institute of Nanoscience, Nanotechnology and Molecular Materials, University of Castilla-La Mancha, Campus de la Fabrica de Armas, Toledo 45071 (Spain); Arranz, Miguel A. [Facultad de Ciencias Quimicas, University of Castilla-La Mancha, Ciudad Real 13071 (Spain)

    2011-02-15

    We have grown both polycrystalline and partially textured cobalt films by magnetron sputter deposition in the range of thickness (50-200 nm). Kinetic roughening of the growing film leads to a controlled rms surface roughness values (1-6 nm) increasing with the as-grown film thickness. Ion erosion of a low energy 1 keV Ar+ beam at glancing incidence (80{sup o}) on the cobalt film changes the surface morphology to a ripple pattern of nanometric wavelength. The wavelength evolution at relatively low fluency is strongly dependent on the initial surface topography (a wavelength selection mechanism hereby confirmed in polycrystalline rough surfaces and based on the shadowing instability). At sufficiently large fluency, the ripple wavelength steadily increases on a coarsening regime and does not recall the virgin surface morphology. Remarkably, the use of a rough virgin surface makes the ripple amplitude in the final pattern can be controllably increased without affecting the ripple wavelength.

  16. Advanced magnetron sputtering techniques-principles and applications

    Institute of Scientific and Technical Information of China (English)

    D.G.Teer

    2004-01-01

    @@ The technique of ion plating was introduced by Mattox[1] in 1963. All PVD techniques used for the deposition of hard wear resistant coatings for tribological applications rely on the ion bombardment of the coating during deposition in order to obtain the required coating properties and are all variations of the original ion plating technique. To obtain a dense, hard, wear resistant coating the ion current density during deposition needs to be high, more than 1 mA/cm2 and the energy of the ions should be not more than about 50 eV.

  17. Nanodot and nanocrystal pattern formation and luminescent properties of BiB 3O 6 glasses after moderate energy ion beam sputtering

    Science.gov (United States)

    Plaza, J. L.; Martínez, O.; Hortelano, V.; Bensalah, H.; Diéguez, E.

    2012-02-01

    In this work we study the nanopatterning effect on the surface of BIBO glasses by means of Ion Beam Sputtering (IBS), using moderate energy (<5 kV) Ar ions. The analysis, changing the energy of the Ar ions, has demonstrated the formation of nanodots, nanorripples, and nanopyramids. We have also analysed the dependence of the nanopatterns on the sample thickness for the same experimental conditions. The sizes of the nanodots have been analysed by AFM, while their optical properties studied by means of μ-Raman/μ-photoluminescence techniques.

  18. Nanodot and nanocrystal pattern formation and luminescent properties of BiB{sub 3}O{sub 6} glasses after moderate energy ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Plaza, J.L., E-mail: joseluis.plaza@uam.es [Laboratorio de Crecimiento de Cristales, Dpto. de Fisica de Materiales, Facultad de Ciencias, Universidad Autonoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Martinez, O., E-mail: oscar@fmc.uva.es [GdS-Optronlab, Dpto. Fisica Materia Condensada, Universidad de Valladolid, Edificio I-D, Paseo de Belen 1, 47011 Valladolid (Spain); Hortelano, V., E-mail: vhorsan@gmail.com [GdS-Optronlab, Dpto. Fisica Materia Condensada, Universidad de Valladolid, Edificio I-D, Paseo de Belen 1, 47011 Valladolid (Spain); Bensalah, H., E-mail: bensalahhakima@yahoo.fr [Laboratorio de Crecimiento de Cristales, Dpto. de Fisica de Materiales, Facultad de Ciencias, Universidad Autonoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Dieguez, E., E-mail: ernesto.dieguez@uam.es [Laboratorio de Crecimiento de Cristales, Dpto. de Fisica de Materiales, Facultad de Ciencias, Universidad Autonoma de Madrid, Cantoblanco, 28049 Madrid (Spain)

    2012-02-01

    In this work we study the nanopatterning effect on the surface of BIBO glasses by means of Ion Beam Sputtering (IBS), using moderate energy (<5 kV) Ar ions. The analysis, changing the energy of the Ar ions, has demonstrated the formation of nanodots, nanorripples, and nanopyramids. We have also analysed the dependence of the nanopatterns on the sample thickness for the same experimental conditions. The sizes of the nanodots have been analysed by AFM, while their optical properties studied by means of {mu}-Raman/{mu}-photoluminescence techniques.

  19. Improving the laser damage resistance of oxide thin films and multilayers via tailoring ion beam sputtering parameters

    Science.gov (United States)

    Cosar, M. B.; Ozhan, A. E. S.; Aydogdu, G. H.

    2015-05-01

    Ion beam sputtering is one of the widely used methods for manufacturing laser optical components due to its advantages such as uniformity, reproducibility, suitability for multilayer coatings and growth of dielectric materials with high packing densities. In this study, single Ta2O5 layers and Ta2O5/SiO2 heterostructures were deposited on optical quality glass substrates by dual ion beam sputtering. We focused on the effect of deposition conditions like substrate cleaning, assistance by 12 cm diameter ion beam source and oxygen partial pressure on the laser-induced damage threshold of Ta2O5 single layers. Afterwards, the obtained information is employed to a sample design and produces a Ta2O5/SiO2 multilayer structure demonstrating low laser-induced damage without a post treatment procedure.

  20. Preparation and comparison of a-C:H coatings using reactive sputter techniques

    Energy Technology Data Exchange (ETDEWEB)

    Keunecke, M., E-mail: martin.keunecke@ist.fraunhofer.d [Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig (Germany); Weigel, K.; Bewilogua, K. [Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig (Germany); Cremer, R.; Fuss, H.-G. [CemeCon AG, Wuerselen (Germany)

    2009-12-31

    Amorphous hydrogenated carbon (a-C:H) coatings are widely used in several industrial applications. These coatings commonly will be prepared by plasma activated chemical vapor deposition (PACVD). The main method used to prepare a-C:H coating in industrial scale is based on a glow discharge in a hydrocarbon gas like acetylene or methane using a substrate electrode powered with medium frequency (m.f. - some 10 to 300 kHz). Some aims of further development are adhesion improvement, increase of hardness and high coating quality on complex geometries. A relatively new and promising technique to fulfil these requirements is the deposition of a-C:H coatings by a reactive d.c. magnetron sputter deposition from a graphite target with acetylene as reactive gas. An advancement of this technique is the deposition in a pulsed magnetron sputter process. Using these three mentioned techniques a-C:H coatings were prepared in the same deposition machine. For adhesion improvement different interlayer systems were applied. The effect of different substrate bias voltages (d.c. and d.c. pulse) was investigated. By applying the magnetron sputter technique in the d.c. pulse mode, plastic hardness values up to 40 GPa could be reached. Besides hardness other mechanical properties like resistance against abrasive wear were measured and compared. Cross sectional SEM images showed the growth structure of the coatings.

  1. Laser sputter neutral mass spectrometry

    Energy Technology Data Exchange (ETDEWEB)

    King, B.V.; Clarke, M.; Hu, H.; Betz [Newcastle Univ., NSW (Australia). Dept. of Physics

    1993-12-31

    Laser sputter neutral mass spectrometry (LSNMS) is an emerging technique for highly sensitive surface analysis. In this technique a target is bombarded with a pulsed beam of keV ions. The sputtered particles are intercepted by a high intensity pulsed laser beam above the surface and ionised with almost 100% efficiency. The photions may then be mass analysed using a quadrupole or, more commonly, using time of flight (TOF) techniques. In this method photoions are extracted from the ionisation region, accelerated to a known energy E{sub o} and strike a channelplate detector a distance `d` away. The flight time `t` of the photoions is then related to their mass by `d` {radical}m / {radical} 2E{sub o} so measurement of `t` allows mass spectra to be obtained. It is found that LSNMS is an emerging technique of great sensitivity and flexibility, useful for both applied analysis and to investigate basic sputtering processes. 4 refs., 3 figs.

  2. Optimization of large area YBa 2Cu 3O 7-x films by single target ion beam sputtering

    Science.gov (United States)

    Gauzzi, A.; Lucia, M. L.; Affronte, M.; Pavuna, D.

    1991-12-01

    We report on the in-situ growth over large area of high-quality homogeneous YBa 2Cu 3O 7-x films by single target ion beam sputtering. The ‘123’ stoichiometry transfer to the substrates is obtained by using sufficiently low power ion beam and a grazing angle between the ion beam and the target. The as-deposited films show consistent homogeneity and reproducible superconducting properties (ΔT c10 6 A cm -2 at 77 K) over areas larger than ≈30 cm 2.

  3. Focused ion beam techniques for fabricating geometrically-complex components and devices.

    Energy Technology Data Exchange (ETDEWEB)

    Mayer, Thomas Michael; Adams, David Price; Hodges, V. Carter; Vasile, Michael J.

    2004-03-01

    We have researched several new focused ion beam (FIB) micro-fabrication techniques that offer control of feature shape and the ability to accurately define features onto nonplanar substrates. These FIB-based processes are considered useful for prototyping, reverse engineering, and small-lot manufacturing. Ion beam-based techniques have been developed for defining features in miniature, nonplanar substrates. We demonstrate helices in cylindrical substrates having diameters from 100 {micro}m to 3 mm. Ion beam lathe processes sputter-define 10-{micro}m wide features in cylindrical substrates and tubes. For larger substrates, we combine focused ion beam milling with ultra-precision lathe turning techniques to accurately define 25-100 {micro}m features over many meters of path length. In several cases, we combine the feature defining capability of focused ion beam bombardment with additive techniques such as evaporation, sputter deposition and electroplating in order to build geometrically-complex, functionally-simple devices. Damascene methods that fabricate bound, metal microcoils have been developed for cylindrical substrates. Effects of focused ion milling on surface morphology are also highlighted in a study of ion-milled diamond.

  4. Properties of Electron-Beam Irradiated CuInSe2 Layers by Multi-Step Sputtering Method.

    Science.gov (United States)

    Kim, Chae-Woong; Kim, Jin Hyeok; Jeong, Chaehwan

    2015-10-01

    Typically, CuInSe2 (CIS) based thin films for photovoltaic devices are deposited by co-evaporation or by deposition of the metals, followed by treatment in a selenium environment. This article describes CIS films that are instead deposited by DC and RF magnetron sputtering from binary Cu2Se and In2Se3 targets without the supply of selenium. As a novel method, electron beam annealing was used for crystallization of Cu2Se/In2Se3 stacked precursors. The surface, cross-sectional morphology, and compositional ratio of CIS films were investigated to confirm the possibility in crystallization without any addition of selenium. Our work demonstrates that the e-beam annealing method can be a good candidate for the rapid crystallization of Cu-In-Se sputtered precursors.

  5. Direct growth of Ge quantum dots on a graphene/SiO2/Si structure using ion beam sputtering deposition.

    Science.gov (United States)

    Zhang, Z; Wang, R F; Zhang, J; Li, H S; Zhang, J; Qiu, F; Yang, J; Wang, C; Yang, Y

    2016-07-29

    The growth of Ge quantum dots (QDs) using the ion beam sputtering deposition technique has been successfully conducted directly on single-layer graphene supported by SiO2/Si substrate. The results show that the morphology and size of Ge QDs on graphene can be modulated by tuning the Ge coverage. Charge transfer behavior, i.e. doping effect in graphene has been demonstrated at the interface of Ge/graphene. Compared with that of traditional Ge dots grown on Si substrate, the positions of both corresponding photoluminescence (PL) peaks of Ge QDs/graphene hybrid structure undergo a large red-shift, which can probably be attributed to the lack of atomic intermixing and the existence of surface states in this hybrid material. According to first-principles calculations, the Ge growth on the graphene should follow the so-called Volmer-Weber mode instead of the Stranski-Krastanow one which is observed generally in the traditional Ge QDs/Si system. The calculations also suggest that the interaction between Ge and graphene layer can be enhanced with the decrease of the Ge coverage. Our results may supply a prototype for fabricating novel optoelectronic devices based on a QDs/graphene hybrid nanostructure.

  6. Effect on electron beam treatment of radio frequency sputtered i-ZnO thin films for solar cell applications.

    Science.gov (United States)

    Jeong, Chaehwan; Kim, Dongjin

    2013-08-01

    Intrinsic ZnO (i-ZnO) thin films were prepared using radio frequency (RF) sputtering method with working pressure range of 1-20 mTorr and treated by electron beam (e-beam) irradiation unit with 300 W of RF power and 2.5 kV of DC power for 5 min. As working pressure increased to 20 mTorr, deposition rate of samples gradually decreased from 0.3 angstroms/sec to 0.18 angstroms/sec and grain size from 23.6 nm to 16.0 nm. After e-beam treatment on RF sputtered i-ZnO thin films with increasing of working pressure, thickness were totally declined by 10% and grain sizes were grown bigger. The electrical properties of e-beam treated samples were remarkably improved to be - 10(18) cm(-3) of carrier concentration, 2-7 cm2/Vs of Hall mobility and - 10(-1) omega x cm of resistivity. Transmittance of e-beam treated samples were up to -90% and optical bandgap increased to 3.27-3.31 eV, resulted from decline of thickness. The better properties of ZnO thin films as a buffer layer in thin film solar cells could be obtained by e-beam treatment method.

  7. Synthesis of Large-Sized Single-Crystal Hexagonal Boron Nitride Domains on Nickel Foils by Ion Beam Sputtering Deposition.

    Science.gov (United States)

    Wang, Haolin; Zhang, Xingwang; Liu, Heng; Yin, Zhigang; Meng, Junhua; Xia, Jing; Meng, Xiang-Min; Wu, Jinliang; You, Jingbi

    2015-12-22

    Large-sized single-crystal h-BN domains with a lateral size up to 100 μm are synthesized on Ni foils by ion-beam sputtering deposition. The nucleation density of h-BN is dramatically decreased by reducing the concentrations of both active sites and species on the Ni surface through a brief in situ pretreatment of the substrate and optimization of the growth parameters, enabling the growth of large-sized domains.

  8. Ion sputtered deposit analysis by electron microscopy

    Energy Technology Data Exchange (ETDEWEB)

    Lundquist, T.R.; Kraus, B.; Swann, P.R. (GATAN, Inc., Warrendale, PA (USA))

    1983-12-15

    The collected deposit formed by sputtering a specimen provides a permanent record of the elemental surface composition. For analysis by X-rays or energy loss in a transmission electron microscope, all the sputtered particles (both ions and neutrals) are collected on a carbon or SiO thin film. Surface analysis can be obtained by exposing different areas of the specimen to the ion beam. Information available in the angular distributions of sputtered particles is retained on the thin film substrate. Depth profiling can be performed by the sequential exposure of different areas of the thin film substrate to the sputtered specimen particles. Examples from stainless steels and silicon compounds are given. The advantage of this ion sputtered deposit analysis (ISDA) technique, apart from its collection efficiency, is its ability to store permanently all the elemental information obtained from a particular experiment. This information can then be processed in a parallel or serial fashion at any time after the sputtering experiment.

  9. Influence of annealing temperature on ZnO thin films grown by dual ion beam sputtering

    Indian Academy of Sciences (India)

    Sushil Kumar Pandey; Saurabh Kumar Pandey; Vishnu Awasthi; Ashish Kumar; Uday P Deshpande; Mukul Gupta; Shaibal Mukherjee

    2014-08-01

    We have investigated the influence of in situ annealing on the optical, electrical, structural and morphological properties of ZnO thin films prepared on -type Si(100) substrates by dual ion beam sputtering deposition (DIBSD) system. X-ray diffraction (XRD) measurements showed that all ZnO films have (002) preferred orientation. Full-width at half-maximum (FWHM) of XRD from the (002) crystal plane was observed to reach to a minimum value of 0.139° from ZnO film, annealed at 600 °C. Photoluminescence (PL) measurements demonstrated sharp near-band-edge emission (NBE) at ∼ 380 nm along with broad deep level emissions (DLEs) at room temperature. Moreover, when the annealing temperature was increased from 400 to 600 °C, the ratio of NBE peak intensity to DLE peak intensity initially increased, however, it reduced at further increase in annealing temperature. In electrical characterization as well, when annealing temperature was increased from 400 to 600 °C, room temperature electron mobility enhanced from 6.534 to 13.326 cm2/V s, and then reduced with subsequent increase in temperature. Therefore, 600 °C annealing temperature produced good-quality ZnO film, suitable for optoelectronic devices fabrication. X-ray photoelectron spectroscopy (XPS) study revealed the presence of oxygen interstitials and vacancies point defects in ZnO film annealed at 400 °C.

  10. Ion beam analysis of TiN/Ti multilayers deposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Andrade, E. E-mail: andrade@fisica.unam.mx; Flores, M.; Muhl, S.; Barradas, N.P.; Murillo, G.; Zavala, E.P.; Rocha, M.F

    2004-06-01

    TiN/Ti multilayers, 1.74-9.80 {mu}m thick, were deposited on 304 stainless steel substrates by reactive unbalanced magnetron sputtering. It is known that such multilayers can improve the corrosion resistance of the stainless steel. The titanium layers help to reduce the occurrence of pinholes that arise because of the irregularities in substrate surface, and decrease the porosity of subsequent TiN coatings by improving the layers microstructure. A 1400 keV deuterium beam was used to analyse the samples and combinations of RBS/NRA methods were applied to evaluate the sample spectra. The {sup 14}N(d,{alpha}{sub 1}) {sup 12}C NR cross sections are well known and were used as way to determine the {sup 14}N concentration in the TiN{sub x} layers. The corrosion resistance of the layers was studied by means of potentiodynamic polarization in a 0.5 M NaCl solution. The corrosion test demonstrated that the number of TiN/Ti layers and its total thickness determine the corrosion resistance.

  11. Structural and corrosion characterization of hydroxyapatite/zirconium nitride-coated AZ91 magnesium alloy by ion beam sputtering

    Science.gov (United States)

    Kiahosseini, Seyed Rahim; Afshar, Abdollah; Mojtahedzadeh Larijani, Majid; Yousefpour, Mardali

    2017-04-01

    The adhesion of hydroxyapatite (HA) as a coating for the AZ91 magnesium alloy substrate can be improved by using the sputtering method and an intermediate layer, such as ZrN. In this study, HA coatings were applied on ZrN intermediate layers at a temperature of 300 °C for 180, 240, 300, 360, and 420 min by ion beam sputtering. A profilometer device was used to study the HA coating thickness, which changed from 2 μm for the 180-min deposition to 4.7 μm for 420-min deposition. The grazing incidence X-ray diffraction analysis method and the Williamson-Hall analysis were used for structural investigation. As the deposition time increased, the crystalline size increased from 50 nm to 690 nm. However, given sufficient time for stress relief on the coating structure, the lattice strain values were close to zero. Energy-dispersive X-ray spectroscopy results showed that the Ca/P ratio ranged from 1.73 to 1.81. The external indentation method was used to evaluate the coating adhesion to the substrate. The slope of curve for applied force changes versus the radius of cracks in the coating (dP/dr) varied in the range of 0.2-0.07 by the deposition time, indicating that the adhesion increased with the increase in coating thickness. The potentiodynamic polarization technique was used to study the corrosion behavior. With increasing deposition time, the corrosion potential of samples did not show a significant change, and the corrosion potential of all samples (coated and uncoated substrates) was more positive than approximately 55 mV. When the deposition time increased to 360 min, the corrosion current density decreased from 5.5 μA/cm2 to 0.33 μA/cm2. After 420 min of deposition, the current density increased to 8.2 μA/cm2. Scanning electron microscopy images of the HA surface layer after 420 min clearly showed cracks on the coating surface, which led to the increase in corrosion current density.

  12. Reactive Ar ion beam sputter deposition of TiO{sub 2} films: Influence of process parameters on film properties

    Energy Technology Data Exchange (ETDEWEB)

    Bundesmann, C., E-mail: carsten.bundesmann@iom-leipzig.de [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Lautenschläger, T.; Thelander, E. [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Spemann, D. [Leibniz-Institut für Oberflächenmodifizierung e.V., Permoserstrasse 15, 04318 Leipzig (Germany); Universität Leipzig, Fakultät für Physik und Geowissenschaften, Institut für Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig (Germany)

    2017-03-15

    Highlights: • Ion beam sputter deposition under systematic variation of process parameters. • Thickness, growth rate, structure, mass density, composition, optical properties. • All TiO{sub 2} films are amorphous with systematic variations in mass density. • Considerable amount of inert process gas correlated with scattering angle. • Correlation of mass density and index of refraction. - Abstract: Several sets of TiO{sub 2} films were grown by Ar ion beam sputter deposition under systematic variation of ion energy and geometrical parameters (ion incidence angle and polar emission angle). The films were characterized concerning thickness, growth rate, structural properties, composition, mass density, and optical properties. The film thicknesses show a cosine-like angular distribution, and the growth rates were found to increase with increasing ion incidence angle and ion energy. All films are amorphous and stoichiometric, but can contain a considerable amount of backscattered primary particles. The atomic fraction of Ar particles decreases systematically with increasing scattering angle, independent from ion energy and ion incidence angle. Mass density and index of refraction show similar systematic variations with ion energy and geometrical parameters. The film properties are mainly influenced by the scattering geometry, and only slightly by ion energy and ion incidence angle. The variations in the film properties are tentatively assigned to changes in the angular and energy distribution of the sputtered target particles and back-scattered primary particles.

  13. Compensation techniques in NIRS proton beam radiotherapy

    Energy Technology Data Exchange (ETDEWEB)

    Akanuma, A. (Univ. of Tokyo, Japan); Majima, H.; Furukawa, S.

    1982-09-01

    Proton beam has the dose distribution advantage in radiation therapy, although it has little advantage in biological effects. One of the best advantages is its sharp fall off of dose after the peak. With proton beam, therefore, the dose can be given just to cover a target volume and potentially no dose is delivered thereafter in the beam direction. To utilize this advantage, bolus techniques in conjunction with CT scanning are employed in NIRS proton beam radiation therapy planning. A patient receives CT scanning first so that the target volume can be clearly marked and the radiation direction and fixation method can be determined. At the same time bolus dimensions are calculated. The bolus frames are made with dental paraffin sheets according to the dimensions. The paraffin frame is replaced with dental resin. Alginate (a dental impression material with favorable physical density and skin surface contact) is now employed for the bolus material. With fixation device and bolus on, which are constructed individually, the patient receives CT scanning again prior to a proton beam treatment in order to prove the devices are suitable. Alginate has to be poured into the frame right before each treatments. Further investigations are required to find better bolus materials and easier construction methods.

  14. ZrN coatings deposited by high power impulse magnetron sputtering and cathodic arc techniques

    Energy Technology Data Exchange (ETDEWEB)

    Purandare, Yashodhan, E-mail: Y.Purandare@shu.ac.uk; Ehiasarian, Arutiun; Hovsepian, Papken [Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Sheffield S1 1WB (United Kingdom); Santana, Antonio [Ionbond AG Olten, Industriestrasse 211, CH-4600 Olten (Switzerland)

    2014-05-15

    Zirconium nitride (ZrN) coatings were deposited on 1 μm finish high speed steel and 316L stainless steel test coupons. Cathodic Arc (CA) and High Power Impulse Magnetron Sputtering (HIPIMS) + Unbalanced Magnetron Sputtering (UBM) techniques were utilized to deposit coatings. CA plasmas are known to be rich in metal and gas ions of the depositing species as well as macroparticles (droplets) emitted from the arc sports. Combining HIPIMS technique with UBM in the same deposition process facilitated increased ion bombardment on the depositing species during coating growth maintaining high deposition rate. Prior to coating deposition, substrates were pretreated with Zr{sup +} rich plasma, for both arc deposited and HIPIMS deposited coatings, which led to a very high scratch adhesion value (L{sub C2}) of 100 N. Characterization results revealed the overall thickness of the coatings in the range of 2.5 μm with hardness in the range of 30–40 GPa depending on the deposition technique. Cross-sectional transmission electron microscopy and tribological experiments such as dry sliding wear tests and corrosion studies have been utilized to study the effects of ion bombardment on the structure and properties of these coatings. In all the cases, HIPIMS assisted UBM deposited coating fared equal or better than the arc deposited coatings, the reasons being discussed in this paper. Thus H+U coatings provide a good alternative to arc deposited where smooth, dense coatings are required and macrodroplets cannot be tolerated.

  15. Improving the laser damage resistance of oxide thin films and multilayers via tailoring ion beam sputtering parameters

    Energy Technology Data Exchange (ETDEWEB)

    Cosar, M.B. [Aselsan Inc. Microelectronics, Guidance and Electro-Optics Division, Cankırı Yolu 7. Km, 06750 Akyurt, Ankara (Turkey); Middle East Technical University, Metallurgical and Materials Engineering Department, Universiteler Mah. Dumlupınar Blv. No: 1, 06800 Cankaya, Ankara (Turkey); Ozhan, A.E.S. [Aselsan Inc. Microelectronics, Guidance and Electro-Optics Division, Cankırı Yolu 7. Km, 06750 Akyurt, Ankara (Turkey); Atılım University, Graduate School of Natural & Applied Sciences, Kızılcasar Mah., 06836 Incek, 06836 Golbası, Ankara (Turkey); Aydogdu, G.H., E-mail: gkuru@aselsan.com.tr [Aselsan Inc. Microelectronics, Guidance and Electro-Optics Division, Cankırı Yolu 7. Km, 06750 Akyurt, Ankara (Turkey)

    2015-05-01

    Highlights: • Increasing the oxygen amount during deposition supports to laser performance. • Ta{sub 2}O{sub 5} films prepared without 12-cm ion source results in lower damage resistance. • We report 15.9 J/cm{sup 2} LIDT value of multilayer application. • This paper presents a novel approach to prepare oxide films without post treatment by tailoring only ion beam deposition parameters that directly influence their laser damage resistance performance. - Abstract: Ion beam sputtering is one of the widely used methods for manufacturing laser optical components due to its advantages such as uniformity, reproducibility, suitability for multilayer coatings and growth of dielectric materials with high packing densities. In this study, single Ta{sub 2}O{sub 5} layers and Ta{sub 2}O{sub 5}/SiO{sub 2} heterostructures were deposited on optical quality glass substrates by dual ion beam sputtering. We focused on the effect of deposition conditions like substrate cleaning, assistance by 12 cm diameter ion beam source and oxygen partial pressure on the laser-induced damage threshold of Ta{sub 2}O{sub 5} single layers. Afterwards, the obtained information is employed to a sample design and produces a Ta{sub 2}O{sub 5}/SiO{sub 2} multilayer structure demonstrating low laser-induced damage without a post treatment procedure.

  16. Molecular depth profiling of organic photovoltaic heterojunction layers by ToF-SIMS: comparative evaluation of three sputtering beams.

    Science.gov (United States)

    Mouhib, T; Poleunis, C; Wehbe, N; Michels, J J; Galagan, Y; Houssiau, L; Bertrand, P; Delcorte, A

    2013-11-21

    With the recent developments in secondary ion mass spectrometry (SIMS), it is now possible to obtain molecular depth profiles and 3D molecular images of organic thin films, i.e. SIMS depth profiles where the molecular information of the mass spectrum is retained through the sputtering of the sample. Several approaches have been proposed for "damageless" profiling, including the sputtering with SF5(+) and C60(+) clusters, low energy Cs(+) ions and, more recently, large noble gas clusters (Ar500-5000(+)). In this article, we evaluate the merits of these different approaches for the in depth analysis of organic photovoltaic heterojunctions involving poly(3-hexylthiophene) (P3HT) as the electron donor and [6,6]-phenyl C61 butyric acid methyl ester (PCBM) as the acceptor. It is demonstrated that the use of 30 keV C60(3+) and 500 eV Cs(+) (500 eV per atom) leads to strong artifacts for layers in which the fullerene derivative PCBM is involved, related to crosslinking and topography development. In comparison, the profiles obtained using 10 keV Ar1700(+) (∼6 eV per atom) do not indicate any sign of artifacts and reveal fine compositional details in the blends. However, increasing the energy of the Ar cluster beam beyond that value leads to irreversible damage and failure of the molecular depth profiling. The profile qualities, apparent interface widths and sputtering yields are analyzed in detail. On the grounds of these experiments and recent molecular dynamics simulations, the discussion addresses the issues of damage and crater formation induced by the sputtering and the analysis ions in such radiation-sensitive materials, and their effects on the profile quality and the depth resolution. Solutions are proposed to optimize the depth resolution using either large Ar clusters or low energy cesium projectiles for sputtering and/or analysis.

  17. Strain Driven Phase Decomposition in Ion-Beam Sputtered Pr1−XCaXMnO3 Films

    Directory of Open Access Journals (Sweden)

    Benedikt Ifland

    2015-01-01

    Full Text Available The deposition of heteroepitaxial thin films on single crystalline substrates by means of physical deposition methods is commonly accompanied by mechanical strain due to lattice mismatch and defect generation. Here we present a detailed analysis of the influence of strain on the Mn solubility of Pr1-XCaXMnO3 thin films prepared by ion-beam sputtering. Combining results from X-ray diffraction, transmission electron microscopy and in situ hot-stage stress measurements, we give strong evidence that large tensile strain during deposition limits the Mn solubility range of the Perovskite phase to near-stoichiometric composition. Mn excess gives rise to MnOz precipitates and the precipitation seems to represent a stress relaxation path. With respect to size and density of the precipitates, the relaxation process can be affected by the choice of substrate and the deposition parameters, that is, the deposition temperature and the used sputter gas.

  18. Structural and superconducting properties of ion beam sputtered Nb thin films and Nb/Cu bilayers

    Science.gov (United States)

    Nath, S. K.; Dhawan, R.; Rai, S.; Lodha, G. S.; Sokhey, K. J. S.

    2012-01-01

    We present the results of a study of structural and superconducting properties of polycrystalline Nb thin films (200 Å, 300 Å, 400 Å, 700 Å and 1000 Å) and Nb/Cu bilayers (300 Å/300 Å and 400 Å/300 Å) prepared on Si substrates by ion beam sputtering at room temperature. The thicknesses, roughnesses at the surfaces and interfaces were determined by X-ray reflectivity whereas the grain sizes were determined from grazing incidence X-ray diffraction and transmission electron microscopic studies. The superconducting transition temperature ( T C) of Nb thin films are smaller than T C of bulk Nb. The Nb-200 Å sample does not show T C down to 2.3 K. The average size of the grains varies from 42 Å for Nb-200 Å sample to 69 Å for Nb-1000 Å sample. Our results show that the T C in these polycrystalline films is not only limited by its thickness but also by the size of the grains. The Nb films deposited in situ on the Cu layer (Nb/Cu) show a marginal increase in average sizes of the grains as compare to their respective values in Nb films of same thicknesses. As a result a marginal increase in T C of these films is also observed. The maximum decrease in T C due to oxygen intake during deposition should be about 0.5 K from its bulk value (9.28 K). We have attributed the large decrease in T C in our case on the basis of decrease in the Debye temperature and density of states at the Fermi level for Nb thin films as compared to their respective values for bulk Nb.

  19. Plasmonic properties of Ag nanoparticles embedded in GeO2-SiO2 matrix by atom beam sputtering.

    Science.gov (United States)

    Mohapatra, Satyabrata

    2016-02-01

    Nanocomposite thin films containing Ag nanoparticles embedded in the GeO2-SiO2 matrix were synthesized by the atom beam co-sputtering technique. The structural, optical and plasmonic properties and the chemical composition of the nanocomposite thin films were studied by transmission electron microscopy (TEM) with energy dispersive X-ray spectroscopy (EDX), UV-visible absorption spectroscopy and X-ray photoelectron spectroscopy (XPS). UV-visible absorption studies on Ag-SiO2 nanocomposites revealed the presence of a strong localized surface plasmon resonance (LSPR) peak characteristic of Ag nanoparticles at 413 nm, which showed a blue shift of 26 nm (413 to 387 nm) along with a significant broadening and drastic decrease in intensity with the incorporation of 16 at% of Ge into the SiO2 matrix. TEM studies on Ag-GeO2-SiO2 nanocomposite thin films confirmed the presence of Ag nanoparticles with an average size of 3.8 nm in addition to their aggregates with an average size of 16.2 nm. Thermal annealing in air resulted in strong enhancement in the intensity of the LSPR peak, which showed a regular red shift of 51 nm (from 387 to 438 nm) with the increase in annealing temperature up to 500 °C. XPS studies showed that annealing in air resulted in oxidation of excess Ge atoms in the nanocomposite into GeO2. Our work demonstrates the possibility of controllably tuning the LSPR of Ag nanoparticles embedded in the GeO2-SiO2 matrix by single-step thermal annealing, which is interesting for optical applications.

  20. Ion beam analysis, corrosion resistance and nanomechanical properties of TiAlCN/CNx multilayer grown by reactive magnetron sputtering

    OpenAIRE

    Alemon, B.; Flores, M.; Canto, C.; E. Andrade; O.G. de Lucio; M.F. Rocha; Broitman, Esteban

    2014-01-01

    A novel TiAlCN/CNx, multilayer coating, consisting of nine TiAlCN/CNx periods with a top layer 0.5 mu m of CNx, was designed to enhance the corrosion resistance of CoCrMo biomedical alloy. The multilayers were deposited by dc and RF reactive magnetron sputtering from Ti0.5Al0.5 and C targets respectively in a N-2/Ar plasma. The corrosion resistance and mechanical properties of the multilayer coatings were analyzed and compared to CoCrMo bulk alloy. Ion beam analysis (IBA) and X-ray diffractio...

  1. Thin copper oxide films prepared by ion beam sputtering with subsequent thermal oxidation: Application in chemiresistors

    Science.gov (United States)

    Horak, P.; Bejsovec, V.; Vacik, J.; Lavrentiev, V.; Vrnata, M.; Kormunda, M.; Danis, S.

    2016-12-01

    Copper oxide films were prepared by thermal oxidation of thin Cu films deposited on substrates by ion beam sputtering. The subsequent oxidation was achieved in the temperature range of 200 °C-600 °C with time of treatment from 1 to 7 h (with a 1-h step) in a furnace open to air. At temperatures 250 °C-600 °C, the dominant phase formed was CuO, while at 200 °C mainly the Cu2O phase was identified. However, the oxidation at 200 °C led to a more complicated composition - in the depth Cu2O phase was observed, though in the near-surface layer the CuO dominant phase was found with a significant presence of Cu(OH)2. A limited amount of Cu2O was also found in samples annealed at 600 °C. The sheet resistance RS of the as-deposited Cu sample was 2.22 Ω/□, after gradual annealing RS was measured in the range 2.64 MΩ/□-2.45 GΩ/□. The highest RS values were obtained after annealing at 300 °C and 350 °C, respectively. Oxygen depth distribution was studied using the 16O(α,α) nuclear reaction with the resonance at energy 3032 keV. It was confirmed that the higher oxidation degree of copper is located in the near-surface region. Preliminary tests of the copper oxide films as an active layer of a chemiresistor were also performed. Hydrogen and methanol vapours, with a concentration of 1000 ppm, were detected by the sensor at an operating temperature of 300 °C and 350 °C, respectively. The response of the sensors, pointed at the p-type conductivity, was improved by the addition of thin Pd or Au catalytic films to the oxidic film surface. Pd-covered films showed an increased response to hydrogen at 300 °C, while Au-covered films were more sensitive to methanol vapours at 350 °C.

  2. Electrical characterization of sputtered ZnO:Al films with microprobe technique

    DEFF Research Database (Denmark)

    Crovetto, Andrea; Kjær, Daniel; Petersen, Dirch Hjorth

    2014-01-01

    microscopy (AFM). The most appropriate choice of deposition and post-deposition process parameters is discussed for application of ZnO:Al films as window layers in thin-film chalcogenide solar cells, where film resistivity should be minimized while maintaining a high transmittance in the spectral region......Determination of sheet resistance, carrier density and mobility in transparent conductive films is typically done with the van der Pauw technique, a rather destructive macroscopic method requiring special sample geometry or dedicated sample patterning. In this work a miniaturized non......-destructive four-point measurement system developed at CAPRES A/S is employed to evaluate the electrical properties of transparent conductive ZnO:Al films, with high spatial resolution, accuracy, and speed of measurement. n-type ZnO:Al films are deposited on fused silica substrates by DC magnetron sputtering using...

  3. Synthesis and characterization of zirconium nitride coatings by cathodic arc sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Sarwar, M.N.; Awan, M.S.; Akbar, S. [ISIT, Islamabad (Pakistan)

    2014-11-15

    Polycrystalline zirconium nitride films (560 nm) were deposited on stainless steel (SS-316) substrates using the multi-target cathodic arc sputtering technique. Deposition was carried out under N{sub 2} reactive atmosphere (4 x 10{sup -3} mbar) at two different temperatures, 150 and 200 C. X-ray diffraction studies show that reflections from planes changed from (111) to (200) for deposition temperatures of 150 C and 200 C, respectively. Films deposited at 150 C and 200 C bear a critical load of 6.4 N and 6.8 N respectively, showing better adherence at higher temperature. This may be the result of film-substrate diffusion at the interface.

  4. Radar absorbing materials based on titanium thin film obtained by sputtering technique

    Directory of Open Access Journals (Sweden)

    Viviane Lilian Soethe

    2011-09-01

    Full Text Available Titanium thin films with nanometer thicknesses were deposited on polyethylene terephthalate (PET substrate using the triode magnetron sputtering technique. It was observed that the titanium thin film-polymeric substrate set attenuates the energy of the incident electromagnetic wave in the frequency range of 8 to 12 GHz. This result allows to consider this set as a radar absorbing material, which may be employed in automobile, telecommunication, aerospace, medical, and electroelectronic areas. Results of the reflectivity show that the attenuation depends on the thin film thickness, as a determining factor. Thin films with 25 to 100 nm thickness values show attenuation of the electromagnetic wave energy from around 20 to 50%. Analyses by Rutherford backscattering spectrometry provided information about the thickness of the thin films studied. Hall effect analyses contributed to better understand the influence of the thin film thickness on the electron mobility and consequently on absorption properties.

  5. Optical characteristics of transparent samarium oxide thin films deposited by the radio-frequency sputtering technique

    Indian Academy of Sciences (India)

    A A ATTA; M M EL-NAHASS; KHALED M ELSABAWY; M M ABD EL-RAHEEM; A M HASSANIEN; A ALHUTHALI; ALI BADAWI; AMAR MERAZGA

    2016-11-01

    Transparent metal oxide thin films of samarium oxide (Sm$_2$O$_3$) were prepared on pre-cleaned fused optically flat quartz substrates by radio-frequency (RF) sputtering technique. The as-deposited thin films were annealed at different temperatures (873, 973 and 1073 K) for 4 h in air under normal atmospheric pressure. The topological morphology of the film surface was characterized by using atomic force microscopy (AFM). The optical properties of the as-prepared and annealed thin films were studied using their reflectance and transmittance spectra at nearly normal incident light. The estimated direct optical band gap energy (E$^{d}_{g}$ ) values were found to increase by increasing the annealing temperatures. The dispersion curves of the refractive index of Sm$_2$O$_3$ thin films were found to obey the single oscillator model.

  6. Production of rare-earth atomic negative ion beams in a cesium-sputter-type negative ion source

    Energy Technology Data Exchange (ETDEWEB)

    Davis, V.T. [Test Support Division, Defense Threat Reduction Agency, West Desert Test Center, Dugway, UT 84022-5000 (United States)]. E-mail: vernon.davis@us.army.mil; Covington, A.M. [Department of Physics, University of Nevada, MS 220, Reno, NV 89557-0058 (United States); Duvvuri, S.S. [Department of Physics, University of Nevada, MS 220, Reno, NV 89557-0058 (United States); Kraus, R.G. [Department of Physics, University of Nevada, MS 220, Reno, NV 89557-0058 (United States); Emmons, E.D. [Department of Physics, University of Nevada, MS 220, Reno, NV 89557-0058 (United States); Kvale, T.J. [Department of Physics and Astronomy, University of Toledo, Toledo, OH (United States); Thompson, J.S. [Department of Physics, University of Nevada, MS 220, Reno, NV 89557-0058 (United States)

    2007-08-15

    The desire to study negative ion structure and negative ion-photon interactions has spurred the development of ion sources for use in research and industry. The many different types of negative ion sources available today differ in their characteristics and abilities to produce anions of various species. Thus the importance of choosing the correct type of negative ion source for a particular research or industrial application is clear. In this study, the results of an investigation on the production of beams composed of negatively-charged rare-earth ions from a cylindrical-cathode-geometry, cesium-sputter-type negative ion source are presented. Beams of atomic anions have been observed for most of the first-row rare-earth elements, with typical currents ranging from hundreds of picoamps to several nanoamps.

  7. Large area superconducting YBa 2Cu 3O 7-x films grown by single target ion beam sputtering

    Science.gov (United States)

    Gauzzi, Andrea; Lucía, Maria L.; Kellett, Bruce J.; James, Jonathan H.; Pavuna, Davor

    1991-10-01

    We have demonstrated, by using a simple single YBa 2Cu 3O 7- x target ion beam system that, with a sufficiently low power ion beam, preferential sputtering is avoided and high-quality YBa 2Cu 3O 7- x films are deposited over areas larger than ≈ 30 cm 2 in a reproducible way. As-deposited films on SrTiO 3 are 50-100 nmthick, c-oriented and show the following reproducible electrical properties (within the given variations): Tc0 =90±0.5 K, transitions widths less than 1 K, j inc(77 K)=1.0-1.2× 10 6 A cm -2, ϱ(300 K)=300±50μΩ cm, ϱ(300 K)/ ϱ(100 K)=2.9±0.1. The extrapolated residual resistivity ϱ res(O K) is between 0 and 5% of ϱ(300 K).

  8. Laser beam shaping theory and techniques, second edition

    CERN Document Server

    Dickey, Fred M

    2014-01-01

    Laser Beam Shaping: Theory and Techniques addresses the theory and practice of every important technique for lossless beam shaping. Complete with experimental results as well as guidance on when beam shaping is practical and when each technique is appropriate, the Second Edition is updated to reflect significant developments in the field. This authoritative text:Features new chapters on axicon light ring generation systems, laser-beam-splitting (fan-out) gratings, vortex beams, and microlens diffusersDescribes the latest advances in beam profile measurement technology and laser beam shaping using diffractive diffusersContains new material on wavelength dependence, channel integrators, geometrical optics, and optical softwareLaser Beam Shaping: Theory and Techniques, Second Edition not only provides a working understanding of the fundamentals, but also offers insight into the potential application of laser-beam-profile shaping in laser system design.

  9. Room-Temperature Growth of SiC Thin Films by Dual-Ion-Beam Sputtering Deposition

    Directory of Open Access Journals (Sweden)

    C. G. Jin

    2008-01-01

    Full Text Available Silicon carbide (SiC films were prepared by single and dual-ion-beamsputtering deposition at room temperature. An assisted Ar+ ion beam (ion energy Ei = 150 eV was directed to bombard the substrate surface to be helpful for forming SiC films. The microstructure and optical properties of nonirradicated and assisted ion-beam irradicated films have been characterized by transmission electron microscopy (TEM, scanning electron microscopy (SEM, Fourier transform infrared spectroscopy (FTIR, and Raman spectra. TEM result shows that the films are amorphous. The films exposed to a low-energy assisted ion-beam irradicated during sputtering from a-SiC target have exhibited smoother and compacter surface topography than which deposited with nonirradicated. The ion-beam irradicated improves the adhesion between film and substrate and releases the stress between film and substrate. With assisted ion-beam irradicated, the density of the Si–C bond in the film has increased. At the same time, the excess C atoms or the size of the sp2 bonded clusters reduces, and the a-Si phase decreases. These results indicate that the composition of the film is mainly Si–C bond.

  10. Dielectric thin-films by ion-beam sputtering deposition for III-V based infrared optoelectronic imaging

    Science.gov (United States)

    Nguyen, Jean

    The growing technological industry is demanding the development of powerful and smaller devices. Dielectric thin-films can play an important role to help push towards achieving these goals. However, their advantage of high-quality material and low material costs compared to bulk can only be achieved with consideration of the technique, conditions, and parameters. The sensitivity makes every step in the process extremely important, beginning from substrate preparation to the first initial layers of growth and ending with the testing/modeling of the devices. Further, not all applications want bulk-like properties, so the ability to adjust and fine tune the material characteristics opens up a wide range of opportunities with the advancements and can drive the power of the devices to an ultimate level. This work provides the motivation, theoretical basis, and experimental results for performance enhancement of optoelectronic devices through the use of high-quality dielectric thin-films by ion-beam sputtering deposition (IBSD). The advantages and disadvantages to this technique are demonstrated and compared to others. The optimization processes, relationships, and motivation of using seven different thin-film materials have been detailed and provided. Using IBSD, the performance improvements were demonstrated on infrared lasers and detectors. For lasers, a 170% increase in maximum output power was achieved using near-0% percent anti-reflection coatings (AR) and near-100% high-reflection (HR) coatings. Following, wide tunability was achieved by using the structures in an external cavity laser system, showing nearly a three-fold improvement in tuning range. Also, structurally robust lasers were achieved with a custom-tailored HR structure designed for damage resistance to high output power density operation, showing over 14W of peak output power for MOCVD lasers. For infrared photodetectors, over a 4 orders of magnitude decrease in current density and zero-bias resistance

  11. Reactive Ar ion beam sputter deposition of TiO2 films: Influence of process parameters on film properties

    Science.gov (United States)

    Bundesmann, C.; Lautenschläger, T.; Thelander, E.; Spemann, D.

    2017-03-01

    Several sets of TiO2 films were grown by Ar ion beam sputter deposition under systematic variation of ion energy and geometrical parameters (ion incidence angle and polar emission angle). The films were characterized concerning thickness, growth rate, structural properties, composition, mass density, and optical properties. The film thicknesses show a cosine-like angular distribution, and the growth rates were found to increase with increasing ion incidence angle and ion energy. All films are amorphous and stoichiometric, but can contain a considerable amount of backscattered primary particles. The atomic fraction of Ar particles decreases systematically with increasing scattering angle, independent from ion energy and ion incidence angle. Mass density and index of refraction show similar systematic variations with ion energy and geometrical parameters. The film properties are mainly influenced by the scattering geometry, and only slightly by ion energy and ion incidence angle. The variations in the film properties are tentatively assigned to changes in the angular and energy distribution of the sputtered target particles and back-scattered primary particles.

  12. Formation of nanoripples on amorphous alumina thin films during low-energy ion-beam sputtering: Experiments and simulations

    Science.gov (United States)

    Babonneau, D.; Vandenhecke, E.; Camelio, S.

    2017-02-01

    The formation of nanopatterns induced by low-energy (0.5-1.5 keV) Xe+ ion-beam sputtering of amorphous alumina thin films is investigated by atomic force microscopy and grazing incidence small-angle x-ray scattering. The observed dependence of the surface morphology on ion incidence angle, temperature, ion energy, and fluence is compared with the predictions of linear and nonlinear continuum theoretical models. The results show that ion-induced mass redistribution stabilizes the surface at near-normal and very grazing incidence angles, while curvature-dependent erosion governs the formation of periodic nanoripples in the range of incidence angles between 50∘ and 65∘. Surface-confined ion-induced viscous flow is shown to be the dominant relaxation mechanism during erosion. Moreover, pattern evolution with ion fluence (pattern ordering and asymmetry of the ripple profile, in particular) suggests that nonlinear effects that are ignored by the Sigmund's collision cascade theory of sputtering contribute strongly to the observed dynamics of ripple formation.

  13. Tunneling conductance studies in the ion-beam sputtered CoFe/Mg/MgO/NiFe magnetic tunnel junctions

    Energy Technology Data Exchange (ETDEWEB)

    Singh, Braj Bhusan; Chaudhary, Sujeet [Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016 (India)

    2013-06-03

    Magnetic tunnel junctions consisting of CoFe(10 nm)/Mg(1 nm)/MgO(3.5 nm)/NiFe(10 nm) are grown at room temperature using dual ion beam sputtering via in-situ shadow masking. The effective barrier thickness and average barrier height are estimated to be 3.5 nm (2.9 nm) and 0.69 eV (1.09 eV) at 290 K (70 K), respectively. The tunnel magnetoresistance value of 0.2 % and 2.3 % was observed at 290 K and 60 K, respectively. The temperature dependence of tunneling conductance revealed the presence of localized states present within the forbidden gap of the MgO barrier leading to finite inelastic spin independent tunneling contributions, which degrade the TMR value.

  14. Electrostatic energy analyzer measurements of low energy zirconium beam parameters in a plasma sputter-type negative ion source.

    Science.gov (United States)

    Malapit, Giovanni M; Mahinay, Christian Lorenz S; Poral, Matthew D; Ramos, Henry J

    2012-02-01

    A plasma sputter-type negative ion source is utilized to produce and detect negative Zr ions with energies between 150 and 450 eV via a retarding potential-type electrostatic energy analyzer. Traditional and modified semi-cylindrical Faraday cups (FC) inside the analyzer are employed to sample negative Zr ions and measure corresponding ion currents. The traditional FC registered indistinct ion current readings which are attributed to backscattering of ions and secondary electron emissions. The modified Faraday cup with biased repeller guard ring, cut out these signal distortions leaving only ringings as issues which are theoretically compensated by fitting a sigmoidal function into the data. The mean energy and energy spread are calculated using the ion current versus retarding potential data while the beam width values are determined from the data of the transverse measurement of ion current. The most energetic negative Zr ions yield tighter energy spread at 4.11 eV compared to the least energetic negative Zr ions at 4.79 eV. The smallest calculated beam width is 1.04 cm for the negative Zr ions with the highest mean energy indicating a more focused beam in contrast to the less energetic negative Zr ions due to space charge forces.

  15. Thermally induced formation of metastable nanocomposites in amorphous Cr-Zr-O thin films deposited using reactive ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Rafaja, David, E-mail: rafaja@ww.tu-freiberg.de [Institute of Materials Science, Freiberg University of Technology, D-09599 Freiberg (Germany); Wüstefeld, Christina [Institute of Materials Science, Freiberg University of Technology, D-09599 Freiberg (Germany); Abrasonis, Gintautas [Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, D-01314 Dresden (Germany); Braeunig, Stefan [Institute of Materials Science, Freiberg University of Technology, D-09599 Freiberg (Germany); Baehtz, Carsten [Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, D-01314 Dresden (Germany); Hanzig, Florian; Dopita, Milan [Institute of Materials Science, Freiberg University of Technology, D-09599 Freiberg (Germany); Krause, Matthias [Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, D-01314 Dresden (Germany); Gemming, Sibylle [Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, D-01314 Dresden (Germany); Institute of Physics, Technische Universität Chemnitz, D-09126 Chemnitz (Germany)

    2016-08-01

    Successive crystallization of amorphous Cr-Zr-O thin films, formation of the (Cr,Zr){sub 2}O{sub 3}/(Zr,Cr)O{sub 2} nanocomposites and the thermally induced changes in the hexagonal crystal structure of metastable (Cr,Zr){sub 2}O{sub 3} were investigated by means of in situ high-temperature synchrotron diffraction experiments up to 1100 °C. The thin films were deposited at room temperature by using reactive ion beam sputtering, and contained 3–15 at.% Zr. At low Zr concentrations, chromium-rich (Cr,Zr){sub 2}O{sub 3} crystallized first, while the crystallization of zirconium-rich (Zr,Cr)O{sub 2} was retarded. Increasing amount of zirconium shifted the onset of crystallization in both phases to higher temperatures. For 3 at.% of zirconium in amorphous Cr-Zr-O, (Cr,Zr){sub 2}O{sub 3} crystallized at 600 °C. At 8 at.% Zr in the films, the crystallization of (Cr,Zr){sub 2}O{sub 3} started at 700 °C. At 15 at.% Zr, the Cr-Zr-O films remained amorphous up to the annealing temperature of 1000 °C. Metastable hexagonal (Cr,Zr){sub 2}O{sub 3} accommodated up to ~ 3 at.% Zr. Excess of zirconium formed tetragonal zirconia, which was stabilized by chromium. - Highlights: • Amorphous Cr-Zr-O thin films were deposited using reactive ion beam sputtering. • After annealing in vacuum, metastable (Cr,Zr){sub 2}O{sub 3}/(Zr,Cr)O{sub 2} nanocomposites form. • The crystallization temperature depends strongly on the Zr concentration. • Metastable hexagonal (Cr,Zr){sub 2}O{sub 3} accommodates up to 3.2 at.% of zirconium. • Zirconium oxide crystallizes in tetragonal form, as it is stabilized by chromium.

  16. Alternative techniques for beam halo measurements

    CERN Document Server

    Welsch, CP; Burel, B; Lefèvre, T; Chapman, T; Pilon, MJ

    2006-01-01

    In future high intensity, high energy accelerators it must be ensured that particle losses are minimized, as activation of the vacuum chambers or other components makes maintenance and upgrade work time consuming and costly. It is imperative to have a clear understanding of the mechanisms that can lead to halo formation and to have the possibility to test available theoretical models with an adequate experimental setup. Measurements based on optical transition radiation (OTR) are a well-established technique for measurements of the transverse beam profile. However, in order to be suitable for halo measurements as well, the dynamic range of the final image acquisition system needs to be high, being able to cover at least five orders of magnitude in intensity changes. Here, the performance of a standard acquisition system as it is used in the CLIC test facility (CTF3) is compared to a step-by-step measurement with a small movable photo multiplier tube and an innovative camera system based on charge injection de...

  17. Adherence of ion beam sputter deposited metal films on H-13 steel

    Science.gov (United States)

    Mirtich, M. J.

    1980-01-01

    An electron bombardment argon ion source sputter deposited 17 metals and metal oxides on H-13 steel. The films ranged 1 to 8 micrometers in thickness and their adherence was generally greater than the capacity of the measuring device; adherence quality depended on proper precleaning of the substrate before deposition. N2 or air was introduced for correct stoichiometry in metallic compounds. Au, Ag, MgO, and Ta5Si3 films 8 microns thick have bond strength equal to 1 micron coatings; the bond strength of pure metallic films up to 5 microns thick was greater than the epoxy to film bond (8000 psi). The results of exposures of coated material to temperatures up to 700 C are presented.

  18. Optimization of large area YBa sub 2 Cu sub 3 O sub 7-x films by single target ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Gauzzi, A.; Lucia, M.L.; Affronte, M.; Pavuna, D. (Inst. for Micro- and Optoelectronics, Swiss Federal Inst. of Tech. (EPFL), Lausanne (Switzerland))

    1991-12-01

    We report on the in-situ growth over large area of high-quality homogeneous YBa{sub 2}Cu{sub 3}O{sub 7-x} films by single target ion beam sputtering. The '123' stoichiometry transfer to the substrates is obtained by using sufficiently low power ion beam and a grazing angle between the ion beam and the target. The as-deposited films show consistent homogeneity and reproducible superconducting properties ({Delta}Tc<1 K, j{sub c}(77K)>10{sup 6} A cm{sup -2} at 77K) over areas larger than {approx equal}30 cm{sup 2}. (orig.).

  19. Sputtered Encapsulation as Wafer Level Packaging for Isolatable MEMS Devices: A Technique Demonstrated on a Capacitive Accelerometer

    Directory of Open Access Journals (Sweden)

    Azrul Azlan Hamzah

    2008-11-01

    Full Text Available This paper discusses sputtered silicon encapsulation as a wafer level packaging approach for isolatable MEMS devices. Devices such as accelerometers, RF switches, inductors, and filters that do not require interaction with the surroundings to function, could thus be fully encapsulated at the wafer level after fabrication. A MEMSTech 50g capacitive accelerometer was used to demonstrate a sputtered encapsulation technique. Encapsulation with a very uniform surface profile was achieved using spin-on glass (SOG as a sacrificial layer, SU-8 as base layer, RF sputtered silicon as main structural layer, eutectic gold-silicon as seal layer, and liquid crystal polymer (LCP as outer encapsulant layer. SEM inspection and capacitance test indicated that the movable elements were released after encapsulation. Nanoindentation test confirmed that the encapsulated device is sufficiently robust to withstand a transfer molding process. Thus, an encapsulation technique that is robust, CMOS compatible, and economical has been successfully developed for packaging isolatable MEMS devices at the wafer level.

  20. A combinatorial approach of developing alloy thin films using co-sputtering technique for displays

    Institute of Scientific and Technical Information of China (English)

    Jaydeep SARKAR; Tien-Heng HUANG; Lih-Ping WANG; Peter H.McDONALD; Chi-Fung LO; Paul S.GILMAN

    2009-01-01

    In this study we have used a combinatorial approach for producing binary and ternary alloy thin film libraries using a lab-scale RF co-sputtering system. Initially we used two elemental sputtering targets, i.e. aluminum (Al) target and neodymium (Nd) target, to produce a film library of varying composition and successfully identified a suitable composition range (1.95-2.38 at% Nd) in which resistance to hillock formation and resistivity of the film spots were found to be satisfactory in annealed state (350℃, 30 min). In another case, in order to form ternary alloy composition library we have used two sputtering targets, i.e. an Al-0.5 at% Nd alloy target and an elemental Ni target. Though, co-sputtered Al-0.6 at% Nd-0.9 at% Ni alloy films showed satisfactory resistance to hillock formation and low resistivity after annealing, film deposited from a ternary alloy target with the same composition failed to show satis-factory resistance to hillock formation during annealing. In case of Al-0.6 at% Nd-0.9 at% Ni alloy target, 250 nm thick film showed poor resistance to hillock formation than the 500 nm thick film. This clearly showed thickness-dependent hillock performance of AI-0.6 at% Nd-0.9 at% Ni alloy. In this study it was found that, in addition to the process variables, metallurgical microstructure of the alloy sputtering targets had significant effect on the film properties which was not obvious from the results of films deposited using co-sputtering of the individual elemental targets.

  1. A combinatorial approach of developing alloy thin films using co-sputtering technique for displays

    Institute of Scientific and Technical Information of China (English)

    Jaydeep; SARKAR; Tien-Heng; HUANG; Lih-Ping; WANG; Peter; H.; McDONALD; Chi-Fung; LO; Paul; S.; GILMAN

    2009-01-01

    In this study we have used a combinatorial approach for producing binary and ternary alloy thin film libraries using a lab-scale RF co-sputtering system. Initially we used two elemental sputtering targets, i.e. aluminum (Al) target and neodymium (Nd) target, to produce a film library of varying composition and successfully identified a suitable composition range (1.95―2.38 at% Nd) in which resistance to hillock formation and resistivity of the film spots were found to be satisfactory in annealed state (350℃, 30 min). In another case, in order to form ternary alloy composition library we have used two sputtering targets, i.e. an Al-0.5 at% Nd alloy target and an elemental Ni target. Though, co-sputtered Al-0.6 at% Nd-0.9 at% Ni alloy films showed satisfactory resistance to hillock formation and low resistivity after annealing, film deposited from a ternary alloy target with the same composition failed to show satis- factory resistance to hillock formation during annealing. In case of Al-0.6 at% Nd-0.9 at% Ni alloy target, 250 nm thick film showed poor resistance to hillock formation than the 500 nm thick film. This clearly showed thickness-dependent hillock performance of Al-0.6 at% Nd-0.9 at% Ni alloy. In this study it was found that, in addition to the process variables, metallurgical microstructure of the alloy sputtering targets had significant effect on the film properties which was not obvious from the results of films deposited using co-sputtering of the individual elemental targets.

  2. Residual stress in Ta2O5-SiO2 composite thin-film rugate filters prepared by radio frequency ion-beam sputtering.

    Science.gov (United States)

    Tang, Chien-Jen; Jaing, Cheng-Chung; Lee, Kuan-Shiang; Lee, Cheng-Chung

    2008-05-01

    Ta-Si oxide composite thin-film rugate filters were prepared by radio frequency ion-beam sputtering and their residual stress and substrate deflections were measured. The residual stress and substrate deflection of these composite film rugate filters were less than that of notch filters made from a series of discrete quarter-wave layers with alternate high and low indices because of the smooth modulation of composition and no interface structure of the rugate filter.

  3. Monte Carlo simulation for the sputtering yield of Si3N4 thin film milled by focused ion beams

    Institute of Scientific and Technical Information of China (English)

    TAN Yong-wen; SONG Yu-min; ZHOU Peng; WANG Cheng-yu; YANG Hai

    2008-01-01

    The sputtering yield of the Si3N4 thin film is calculated by Monte Carlo method with different parameters. The dependences of the sputtering yield on the incident ion energy, the incident angle and the number of Gallium (Ga) and Arsenic (As) ions are predicted. The abnormal sputtering yield for As at 90 keV occurs when the incident angle reaches the range between 82°and 84°.

  4. Nanostructures on GaAs surfaces due to 60 keV Ar{sup +}-ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Venugopal, V., E-mail: vinay.venu@gmail.com [Institute of Physics, Sachivalaya Marg, Bhubaneswar 751 005 (India); Division of Physics, School of Advanced Sciences, VIT University, Chennai Campus, Chennai 600 048 (India); Garg, Sandeep Kumar; Basu, Tanmoy [Institute of Physics, Sachivalaya Marg, Bhubaneswar 751 005 (India); Sinha, Om Prakash [Amity Institute of Nanotechnology, Amity University, Noida 201 303 (India); Kanjilal, D. [Inter-Univeristy Accelerator Center, Aruna Asaf Ali Marg, Delhi 110 067 (India); Bhattacharyya, S.R. [Saha Institute of Nuclear Physics, Kolkata 700 064 (India); Som, T. [Institute of Physics, Sachivalaya Marg, Bhubaneswar 751 005 (India)

    2012-02-15

    The effect of 60 keV Ar{sup +}-ion beam sputtering on the surface topography of p-type GaAs(1 0 0) was investigated by varying angle of incidence of the ion (060 Degree-Sign ) with respect to substrate normal and the ion fluence (2 Multiplication-Sign 10{sup 17}3 Multiplication-Sign 10{sup 18} ions/cm{sup 2}) at an ion flux of 3.75 Multiplication-Sign 10{sup 13} ions/cm{sup 2}-s. For normal incidence and at a fluence of 2 Multiplication-Sign 10{sup 17} ions/cm{sup 2}, holes and islands are observed with the former having an average size and density of 31 nm and 4.9 Multiplication-Sign 10{sup 9} holes/cm{sup 2}, respectively. For 30 Degree-Sign and 45 Degree-Sign off-normal incidence, in general, a smooth surface appears which is unaffected by increase of fluence. At 60 Degree-Sign off-normal incidence dots are observed while for the highest fluence of 3 Multiplication-Sign 10{sup 18} ions/cm{sup 2} early stage of ripple formation along with dots is observed with amplitude of 4 nm. The applicability and limitations of the existing theories of ion induced pattern formation to account for the observed surface topographies are discussed.

  5. Bias-dependent photo-detection of dual-ion beam sputtered MgZnO thin films

    Indian Academy of Sciences (India)

    Saurabh Kumar Pandey; Shaibal Mukherjee

    2016-02-01

    The structural, morphological, elemental and electrical properties of MgZnO thin films, grown on p-Si (001) substrates by dual-ion beam sputtering deposition (DIBSD) system at different substrate temperatures were thoroughly investigated. X-ray diffraction (XRD) pattern of MgZnO film exhibited crystalline hexagonal wurtzite structure with the preferred (002) crystal orientation. The full-width at half-maximum of the (002) plane was the narrowest with a value of 0.226° from MgZnO film grown at 400°C. X-ray photoelectron spectroscopy analysis confirmed the substitution of Zn$^{2+}$ by Mg$^{2+}$ in MgZnO thin films and the absence of MgO phase. Correlation between calculated crystallite size, as evaluated from XRD measurements, and room-temperature carrier mobility, as obtained from Hall measurements, was established. Current–voltage characteristics of MgZnO thin films were carried out under the influence of dark and light illumination conditions and corresponding values of photosensitivity were calculated. MgZnO film grown at 100°C exhibited the highest photosensitivity of 1.62. Compared with one of the best-reported values of photosensitivity factor from ZnO-material-based films available in the literature, briefly, $\\sim$3.085-fold improved photosensitivity factor at the same bias voltage (2 V) was obtained.

  6. High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition

    Science.gov (United States)

    Becker, Hans W.; Sobel, Frank; Aschke, Lutz; Renno, Markus; Krieger, Juergen; Buttgereit, Ute; Hess, Guenter; Lenzen, Frank; Knapp, Konrad; Yulin, Sergey A.; Feigl, Torsten; Kuhlmann, Thomas; Kaiser, Norbert

    2002-12-01

    EUV mask blanks consist of two thin film systems deposited on low thermal expansion 6 inch substrates (LTEM). First there is the multilayer stack with around 100 alternating layers of elements with different optical properties which are topped by a capping layer. The absorber stack which consists of a buffer and a absorber layer is next. Here a minimum absorption of EUV light of 99 % is required. The stress in both layer systems should be as low as possible. The reduction of defects to an absolute minimum is one of the main challenges. The high-reflective Mo/Si multilayer coatings were designed for normal incidence reflectivity and successfully deposited on 6-inch LTEM substrates by ion-beam sputtering. X-ray scattering, transmission electron microscopy and atomic force microscopy were used for characterization of the multilayer interfaces and the surface morphology. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation at the "Physikalisch- Technischen Bundesanstalt" (PTB) refelctometer at BESSY II, Berlin, Germany. A high resolution laser scanner was used to measure the particle distribution. First multilayer defect results are presented.

  7. Ion beam analysis, corrosion resistance and nanomechanical properties of TiAlCN/CNx multilayer grown by reactive magnetron sputtering

    Science.gov (United States)

    Alemón, B.; Flores, M.; Canto, C.; Andrade, E.; de Lucio, O. G.; Rocha, M. F.; Broitman, E.

    2014-07-01

    A novel TiAlCN/CNx multilayer coating, consisting of nine TiAlCN/CNx periods with a top layer 0.5 μm of CNx, was designed to enhance the corrosion resistance of CoCrMo biomedical alloy. The multilayers were deposited by dc and RF reactive magnetron sputtering from Ti0.5Al0.5 and C targets respectively in a N2/Ar plasma. The corrosion resistance and mechanical properties of the multilayer coatings were analyzed and compared to CoCrMo bulk alloy. Ion beam analysis (IBA) and X-ray diffraction tests were used to measure the element composition profiles and crystalline structure of the films. Corrosion resistance was evaluated by means of potentiodynamic polarization measurements using simulated body fluid (SBF) at typical body temperature and the nanomechanical properties of the multilayer evaluated by nanoindentation tests were analyzed and compared to CoCrMo bulk alloy. It was found that the multilayer hardness and the elastic recovery are higher than the substrate of CoCrMo. Furthermore the coated substrate shows a better general corrosion resistance than that of the CoCrMo alloy alone with no observation of pitting corrosion.

  8. Structure and composition of zirconium carbide thin-film grown by ion beam sputtering for optical applications

    Energy Technology Data Exchange (ETDEWEB)

    Singh, Amol, E-mail: modimh@rrcat.gov.in; Modi, Mohammed H., E-mail: modimh@rrcat.gov.in; Dhawan, Rajnish, E-mail: modimh@rrcat.gov.in; Lodha, G. S., E-mail: modimh@rrcat.gov.in [X-ray Optics Section, ISU Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India)

    2014-04-24

    Thin film of compound material ZrC was deposited on Si (100) wafer using ion beam sputtering method. The deposition was carried out at room temperature and at base pressure of 3×10{sup −5} Pa. X-ray photoelectron spectroscopy (XPS) measurements were performed for determining the surface chemical compositions. Grazing incidence x-ray reflectivity (GIXRR) measurements were performed to study the film thickness, roughness and density. From GIXRR curve roughness value of the film was found less than 1 nm indicating smooth surface morphology. Films density was found 6.51 g/cm{sup 3}, which is close to bulk density. Atomic force microscopy (AFM) measurements were performed to check the surface morphology. AFM investigation showed that the film surface is smooth, which corroborate the GIXRR data. Figure 2 of the original article PDF file, as supplied to AIP Publishing, contained a PDF processing error. This article was updated on 12 May 2014 to correct that error.

  9. Structure and electrical properties of quaternary Cr–Si–Ni–W films prepared by ion beam sputter deposition

    Energy Technology Data Exchange (ETDEWEB)

    Wang, X.Y., E-mail: wxy@tju.edu.cn [School of Electronic Information Engineering, Tianjin University, Tianjin 300072 (China); Ma, J.X.; Li, C.G. [School of Electronic Information Engineering, Tianjin University, Tianjin 300072 (China); Shao, J.Q. [BDS Electronics Co., Ltd., Bengbu 233010 (China)

    2014-08-01

    Highlights: • Quaternary Cr–Si–Ni–W thin film was prepared by IBSD. • As-deposited Cr–Si–Ni–W films show nanocrystalline state in XRD analysis. • Big massive particles in Cr–Si–Ni–W films are mainly formed in deposition process. • Conduction mechanism was discussed based on microscopic analysis. - Abstract: Si-rich Cr–Si–Ni–W films were deposited by ion beam sputter deposition (IBSD) using a mother alloy target on polished Al{sub 2}O{sub 3} substrates. Effects of ion beam voltage, annealing temperature and deposition time on sheet resistance and TCR of Cr–Si–Ni–W films were studied. Experimental results reveal that the as-deposited Cr–Si–Ni–W films obtained by IBSD show a crystalline state because of a high mobility of deposition atoms and molecules with more energy obtained from high energy ions. XRD and AFM analysis show that the big massive particles mainly composed of Si and CrSi{sub 2} in Cr–Si–Ni–W films are formed in the process of IBSD rather than in post-annealing stage. Long deposition time is significantly important to a decrease of the number and size of gaps between big particles in Cr–Si–Ni–W films and to an improvement of the continuity and compactness of film structure, influencing resistivity and TCR of deposition film. The conduction mechanism was discussed based on microscopic analysis and the conductive model proposed for Cr–Si–Ni–W films mainly composed of big particles.

  10. New techniques in hadrontherapy: intensity modulated proton beams.

    Science.gov (United States)

    Cella, L; Lomax, A; Miralbell, R

    2001-01-01

    Inverse planning and intensity modulated (IM) X-ray beam treatment techniques can achieve significant improvements in dose distributions comparable to those obtained with forward planned proton beams. However, intensity modulation can also be applied to proton beams and further optimization in dose distribution can reasonably be expected. A comparative planning exercise between IM X-rays and IM proton beams was carried out on two different tumor cases: a pediatric rhabdomyosarcoma and a prostate cancer. Both IM X-rays and IM protons achieved equally homogenous coverage of the target volume in the two tumor sites. Predicted NTCPs were equally low for both treatment techniques. Nevertheless, a reduced low-to-medium dose to the organs at risk and a lesser integral non-target mean dose for IM protons in the two cases favored the use of IM proton beams.

  11. Reactive sputter deposition

    CERN Document Server

    Mahieu, Stijn

    2008-01-01

    In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

  12. Research on fabricating technique of Ba-Al-S:Eu sputtering target

    Institute of Scientific and Technical Information of China (English)

    DING Zhao; YU Zhinong; ZHANG Dongpu; XUE Wei; WANG Wuyu

    2009-01-01

    Ba-Al-S-Eu sputtering target for blue emitting phosphors was prepared by powder sintering method. XRD patterns showed that the main components of the target were barium tetra aluminum sulfide (BaAl4S7), bariutm sulfide (BaS), and europium sulfide (EuS). In the samples, part of the barium and aluminum are formed into barium aluminum oxide (BaAl2O4) with the impurity element of oxygen. The PL characteristic spectra of the target showed the 470 nm blue emission obviously, and the Ba-Al-S thin films also transmitted a purple-blue emission at the position of 440 nm.The results indicated that this method was suitable for the fabrication of the Ba-Al-S:Eu sputtering target.

  13. Characterization of ZnO:SnO2 (50:50) thin film deposited by RF magnetron sputtering technique

    Science.gov (United States)

    Cynthia, S. R.; Sivakumar, R.; Sanjeeviraja, C.; Ponmudi, S.

    2016-05-01

    Zinc oxide (ZnO) and tin oxide (SnO2) thin films have attracted significant interest recently for use in optoelectronic application such as solar cells, flat panel displays, photonic devices, laser diodes and gas sensors because of their desirable electrical and optical properties and wide band gap. In the present study, thin films of ZnO:SnO2 (50:50) were deposited on pre-cleaned microscopic glass substrate by RF magnetron sputtering technique. The substrate temperature and RF power induced changes in structural, surface morphological, compositional and optical properties of the films have been studied.

  14. A Investigation of Radiotherapy Electron Beams Using Monte Carlo Techniques

    Science.gov (United States)

    Ding, George X.

    1995-01-01

    Radiotherapy electron beams are more complicated than photon beams due to variations in the beam production, the scattering of low-energy electrons, and the presence contaminant photons. The detailed knowledge of a radiotherapy beam is essential to an accurate calculation of dose distribution for a treatment planning system. This investigation aims to enhance our understanding of radiotherapy beams by focusing on electron beams used in radiotherapy. It starts with a description of the Monte Carlo simulation code, BEAM, and a detailed simulation of an accelerator head to obtain realistic radiotherapy beams. The simulation covers electron beams from various accelerators, including the NRC research accelerator, the NPL (UK), accelerator, A Varian Clinac 2100C, a Philips SL75-20, a Siemens KD2, an AECL Therac 20, and a Scanditronix MM50. The beam energies range from 4 to 50 MeV. The EGS4 user code, BEAM, is extensively benchmarked against experiment by comparing calculated dose distributions with measured dose distributions in water. The simulated beams are analyzed to obtain the characteristics of various electron beams from a variety of accelerators. The simulated beams are also used as inputs to calculate the following parameters: the mean electron energy, the most probable energy, the energy-range relationships, the depth-scaling factor to convert depths in plastic to water-equivalent depths, the water-to-air stopping-power ratios, and the electron fluence correction factors used to convert dose measured in plastics to dose in water. These parameters are essential for electron beam dosimetry. The results from this study can be applied in cancer clinics to improve the accuracy of the absolute dosimetry. The simulation also provides information about the backscatter into the beam monitor chamber, and predicts the influence on the beam output factors. This investigation presents comprehensive data on the clinical electron beams, and answers many questions which could

  15. Beam dynamics in rf guns and emittance correction techniques

    Science.gov (United States)

    Serafini, Luca

    1994-02-01

    In this paper we present a general review of beam dynamics in a laser-driven rf gun. The peculiarity of such an accelerating structure versus other conventional multi-cell linac structures is underlined on the basis of the Panofsky-Wenzel theorem, which is found to give a theoretical background for the well known Kim's model. A basic explanation for some proposed methods to correct rf induced emittance growth is also derived from the theorem. We also present three emittance correction techniques for the recovery of space-charge induced emittance growth, namely the optimum distributed disk-like bunch technique, the use of rf spatial harmonics to correct spherical aberration induced by space charge forces and the technique of emittance filtering by clipping the electron beam. The expected performances regarding the beam quality achievable with different techniques, as predicted by scaling laws and simulations, are analyzed, and, where available, compared to experimental results.

  16. Fundamental sputtering studies: Nonresonant ionization of sputtered neutrals

    Energy Technology Data Exchange (ETDEWEB)

    Burnett, J.W.; Pellin, M.J.; Calaway, W.F.; Gruen, D.M. (Argonne National Lab., IL (United States)); Yates, J.T. Jr. (Pittsburgh Univ., PA (United States). Dept. of Chemistry)

    1989-01-04

    Because of the practical importance of sputtering, numerous theories and computer simulations are used for predicting many aspects of the sputtering process. Unfortunately, many of the calculated sputtering results are untested by experiment. Until recently, most sputtering experiments required either very high ion fluences or the detection of only minor constituents of the sputtered flux, i.e., ions. These techniques may miss the subtleties involved in the sputtering process. High-detection-efficiency mass spectrometry, coupled with the laser ionization of neutral atoms, allows the detection of the major sputtered species with very low incident ion fluences. The depth-of-origin of sputtered atoms is one example of an important but poorly understood aspect of the sputtering process. By following the sputtering yield of a substrate atom with various coverages of an adsorbed overlayer, the depth of origin of sputtered atoms has been determined. Our results indicate that two-thirds of the sputtered flux originates in the topmost atomic layer. The ion-dose dependence of sputtering yields has long been assumed to be quite minor for low- to-moderate primary ion fluences. We have observed a two-fold decrease in the sputtering yield of the Ru(0001) surface for very low primary ion fluences. Data analysis results in a cross section for damage of 2.7 {plus minus} 1.0 {times} 10{sup {minus}15}cm{sup 2}. 40 refs., 3 figs., 2 tabs.

  17. Production of nanohole/nanodot patterns on Si(001) by ion beam sputtering with simultaneous metal incorporation

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez-GarcIa, J A; Gago, R; Caillard, R; Martin-Gago, J A; Palomares, F J; Fernandez, M; Vazquez, L [Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones CientIficas, E-28049 Madrid (Spain); Redondo-Cubero, A [Centro de Micro-Analisis de Materiales, Universidad Autonoma de Madrid, E-28049 Madrid (Spain)], E-mail: lvb@icmm.csic.es

    2009-06-03

    We have established the conditions for which nanohole and nanodot patterns are produced on Si(001) surfaces by 1 keV Ar{sup +} ion beam sputtering (IBS) at normal incidence with an alternating cold cathode ion source (ACC-IS). Nanohole patterns are produced within a narrow IBS window for low ion fluxes (<100 {mu}A cm{sup -2}) and relatively low ion fluences (<10{sup 18} ions cm{sup -2}) whereas nanodot morphologies are produced above this window. The nanohole pattern is not stable after prolonged irradiation since it evolves to a nanodot morphology. Rutherford backscattering spectrometry (RBS) measurements show that nanohole patterns are produced when the metal content on the irradiated surfaces is higher (within (2.5-3.5 x 10{sup 15}) atoms cm{sup -2}) than in the case of nanodots (<2.5 x 10{sup 15} atoms cm{sup -2}). The different metal content is related to the ACC-IS operation, since the set-up provides simultaneous incorporation of Fe and Mo on the target surface from the erosion of the cathodes and sample holder, respectively. The role of metal incorporation on pattern selectivity has been corroborated qualitatively by extending the results obtained with the ACC-IS to a standard Kaufman-type source. In order to gain further information on the metal effects, chemical analysis of the surface has been performed to complement the compositional RBS results, showing for the first time the relevant participation of metal silicides. Further outlook and a discussion regarding the role of metal incorporation are also given.

  18. Characterisation of the properties of a negative hydrogen ion beam by several beam diagnostic techniques

    Science.gov (United States)

    Maurizio, R.; Fantz, U.; Bonomo, F.; Serianni, G.

    2016-06-01

    The beam properties of the BATMAN negative ion source, which is the prototype of one module of the source for the ITER neutral beam injection system, are characterised by means of three diagnostic techniques: beam emission spectroscopy (BES), the experimental calorimeter mini-STRIKE and a copper calorimeter. The main beam parameters—beam divergence, homogeneity and top-bottom asymmetries—are studied in different operational scenarios: with different magnetic filter field setups, source settings and with different gases (hydrogen or deuterium). Among all dependences, the influence of the magnetic field configuration on the beam and the evolution of the beam features during some conditioning days are investigated in detail. Data show that the stronger the filter field in the beam region, the higher the beam top-bottom asymmetry—likely a v× B effect. During the conditioning of the source, such vertical beam asymmetry increases as well, suggesting an inhomogeneous H -production at the first grid of the extraction system.

  19. Quantitative and Qualitative Study of Gaussian Beam Visualization Techniques

    CERN Document Server

    Magnes, J; Hartke, J; Fountain, M; Florence, L; Davis, V

    2006-01-01

    We present a comparative overview of existing laser beam profiling methods. We compare the the knife-edge, scanning slit, and pin-hole methods. Data is presented in a comparative fashion. We also elaborate on the use of CCD profiling methods and present appropriate imagery. These methods allow for a quantitative determination of transverse laser beam-profiles using inexpensive and accessible methods. The profiling techniques presented are inexpensive and easily applicable to a variety of experiments.

  20. Ion beam sputtered nanostructured semiconductor surfaces as templates for nanomagnet arrays

    Energy Technology Data Exchange (ETDEWEB)

    Teichert, C [Institute of Physics, University of Leoben, 8700 Leoben (Austria); De Miguel, J J [Department of Condensed Matter Physics, Universidad Autonoma de Madrid, Cantoblanco, 28049 Madrid (Spain); Bobek, T [Institute of Semiconductor Technology, University of Aachen, 52074 Aachen (Germany)], E-mail: teichert@unileoben.ac.at

    2009-06-03

    The ongoing tendency for increasing the storage densities in magnetic recording techniques requires a search for efficient routes to fabricate and characterize nanomagnet arrays on solid supports. Spontaneous pattern formation in semiconductor heteroepitaxy or under ion erosion of semiconductor surfaces yields nanostructured substrates that can serve as templates for subsequent deposition of magnetic material. The nanostructured morphology of the template can easily be replicated into the magnetic coating by means of the shadow deposition technique which allows one to selectively cover specific areas of the template with magnetic material. Here, we demonstrate that ion bombardment induced hexagonally arranged GaSb dots are suitable templates for fabricating by shadow deposition close-packed nanomagnets with a lateral extension of {<=}50 nm, i.e. with a resulting storage density of up to 0.2 Tbit in{sup -2}. Magnetic-force microscopy (MFM) measurements revealed that the individual nanomagnets-which are located on the tops of the semiconductor hillocks-are single domain and show mainly independent magnetization. The coupling behaviour was estimated from correlation function analysis of the MFM data. In addition, magneto-optical Kerr effect measurements demonstrate that the nanomagnets can be magnetized either out-of-plane or in-plane and show remanence at room temperature, with a coercive field of 120 mT.

  1. Interface controlled growth of nanostructures in discontinuous Ag and Au thin films fabricated by ion beam sputter deposition for plasmonic applications

    Indian Academy of Sciences (India)

    R Brahma; M Ghanashyam Krishna

    2012-08-01

    The growth of discontinuous thin films of Ag and Au by low energy ion beam sputter deposition is reported. The study focuses on the role of the film–substrate in determining the shape and size of nanostructures achieved in such films. Ag films were deposited using Ar ion energy of 150 eV while the Au films were deposited with Ar ion energies of 250–450 eV. Three types of interfaces were investigated in this study. The first set of film–substrate interfaces consisted of Ag and Au films grown on borosilicate glass and carbon coated Cu grids used as substrates. The second set of films was metallic bilayers in which one of the metals (Ag or Au) was grown on a continuous film of the other metal (Au or Ag). The third set of interfaces comprised of discontinuous Ag and Au films deposited on different dielectrics such as SiO2, TiO2 and ZrO2. In each case, a rich variety of nanostructures including self organized arrays of nanoparticles, nanoclusters and nanoneedles have been achieved. The role of the film–substrate interface is discussed within the framework of existing theories of thin film nucleation and growth. Interfacial nanostructuring of thin films is demonstrated to be a viable technique to realize a variety of nanostructures. The use of interfacial nanostructuring for plasmonic applications is demonstrated. It is shown that the surface Plasmon resonance of the metal nanostructures can be tuned over a wide range of wavelengths from 400 to 700 nm by controlling the film–substrate interface.

  2. Effect of film thickness on the magneto-structural properties of ion beam sputtered transition metal-metalloid FeCoNbB/Si (100) alloy thin films

    Science.gov (United States)

    Gupta, Pooja; Tripathi, Yagyanidhi; Kumar, Dileep; Rai, S. K.; Gupta, Mukul; Reddy, V. R.; Svec, Peter

    2016-08-01

    The structure and magnetic properties of ion beam sputtered transition metal-metalloid FeCoNbB/Si(100) alloy thin film have been studied as a function of film thickness using complementary techniques of x-ray reflectivity (XRR), grazing incidence x-ray diffraction, and magneto optical Kerr effect. Thicknesses of the films range from ˜200 to 1500 Å. The coercivity of all the films ranges between 4 and 14 Oe, which suggests soft magnetic nature of FeCoNbB/Si thin films. Films with thickness up to 800 Å are amorphous in nature and are found to possess uniaxial magnetic anisotropy in the film plane, although no magnetic field was applied during deposition. The presence of the two fold symmetry in such amorphous thin films may be attributed to quenched-in stresses developed during deposition. Upon increasing the film thickness to ˜1200 Å and above, the structure of FeCoNbB films transforms from amorphous to partially nanocrystalline structure and has bcc-FeCo nanocrystalline phase dispersed in remaining amorphous matrix. The crystalline volume fraction (cvf) of the films is found to be proportional to the film thickness. Azimuthal angle dependence of remanence confirms the presence of in-plane four-fold anisotropy (FFA) in the crystalline film with cvf ˜75%. Synchrotron x-ray diffraction measurement using area detector suggests random orientation of crystallites and thus clearly establishes that FFA is not related to texture/cubic symmetry in such polycrystalline thin films. As supported by asymmetric Bragg diffraction measurements, the origin of FFA in such partially crystalline thin film is ascribed to the additional compressive stresses developed in the film upon crystallization. Results indicate that promising soft magnetic properties in such films can be optimized by controlling the film thickness. The revelation of controllable and tunable anisotropy suggests that FeCoNbB thin films can have potential application in electromagnetic applications.

  3. Radiosurgery with high energy photon beams: a comparison among techniques

    Energy Technology Data Exchange (ETDEWEB)

    Podgorsak, E.B.; Pike, G.B.; Olivier, A.; Pla, M.; Souhami, L.

    1989-03-01

    The presently known radiosurgical techniques with high energy photon beams are based either on the commercially available Gamma unit utilizing 201 stationary cobalt beams or on isocentric linear accelerators. The techniques using linear accelerators are divided into the single plane rotation, the multiple non-coplanar arcs, and the dynamic rotation. A brief description of these techniques is given, and their physical characteristics, such as precision of dose delivery, dose fall-off outside the target volume, and isodose distributions are discussed. It is shown that the multiple non-coplanar arcs technique and the dynamic rotation give dose distributions similar to those of the Gamma unit, which makes these two linear accelerator based techniques attractive alternatives to radiosurgery with the Gamma unit.22 references.

  4. Large areas elemental mapping by ion beam analysis techniques

    Science.gov (United States)

    Silva, T. F.; Rodrigues, C. L.; Curado, J. F.; Allegro, P.; Moro, M. V.; Campos, P. H. O. V.; Santos, S. B.; Kajiya, E. A. M.; Rizzutto, M. A.; Added, N.; Tabacniks, M. H.

    2015-07-01

    The external beam line of the Laboratory for Material Analysis with Ion Beams (LAMFI) is a versatile setup for multi-technique analysis. X-ray detectors for Particle Induced X-rays Emission (PIXE) measurements, a Gamma-ray detector for Particle Induced Gamma- ray Emission (PIGE), and a particle detector for scattering analysis, such as Rutherford Backscattering Spectrometry (RBS), were already installed. In this work, we present some results, using a large (60-cm range) XYZ computer controlled sample positioning system, completely developed and build in our laboratory. The XYZ stage was installed at the external beam line and its high spacial resolution (better than 5 μm over the full range) enables positioning the sample with high accuracy and high reproducibility. The combination of a sub-millimeter beam with the large range XYZ robotic stage is being used to produce elemental maps of large areas in samples like paintings, ceramics, stones, fossils, and all sort of samples. Due to its particular characteristics, this is a unique device in the sense of multi-technique analysis of large areas. With the continuous development of the external beam line at LAMFI, coupled to the robotic XYZ stage, it is becoming a robust and reliable option for regular analysis of trace elements (Z > 5) competing with the traditional in-vacuum ion-beam-analysis with the advantage of automatic rastering.

  5. Quantitative analysis of growth-induced reduction of long range lattice order in ion-beam sputtered YBa2Cu3O6.9 films

    Science.gov (United States)

    Gauzzi, Andrea; Pavuna, Davor

    1995-04-01

    We report evidence for the reduction of long range lattice order caused by slight departures from the optimal growth temperature in fully doped (x≊0.9) YBa2Cu3O6+x films deposited by ion-beam sputtering on SrTiO3. We estimate the characteristic length of this disorder from the broadening Δϑ of the x-ray diffraction rocking curve. The depression of superconductivity and normal conductivity scales as Δϑ and disappears when the in-plane lattice coherence length rc˜1/Δϑ is larger than ≊10 nm.

  6. Effect of nitrogen flow ratio on structure and properties of zirconium nitride films on Si(100) prepared by ion beam sputtering

    Indian Academy of Sciences (India)

    Shahab Norouzian; Majid Mojtahedzadeh Larijani; Reza Afzalzadeh

    2012-10-01

    In this study, zirconium nitride thin films were deposited on Si substrates by ion beam sputtering (IBS). Influence of N2/(N2+Ar) on the structural and physical properties of the films has been investigated with respect to the atomic ratio between nitrogen and zirconium. It was found that the thickness of layers decreased by increasing the F(N2). Moreover, crystalline plane peaks such as (111), (200) and (220) with (111) preferred orientation were observed due to strain energy which associate with (111) orientation in ZrN. Also, the fluctuation in nitrogen flow ratio results in colour and electrical resistivity of films.

  7. Application of the Ta liner technique to produce Ca beams at INFN-Legnaro National Laboratories (INFN-LNL).

    Science.gov (United States)

    Galatà, A; Sattin, M; Manzolaro, M; Martini, D; Facco, A; Tinschert, K; Spaedtke, P; Lang, R; Kulevoy, T

    2014-02-01

    The ECR ion sources are able to produce a wide variety of highly charged metallic ion beams thanks to the development of different techniques (ovens, sputtering, direct insertion, metal ions from volatile compounds (MIVOC)). In the case of the ovens, the sticking of the hot vapors on the surface of the plasma chamber leads to high material consumption rates. For elements like Ca, a tantalum liner inserted inside the chamber can be used to limit this phenomenon. The modeling of temperature distribution inside the chamber with and without the liner was carried out with COMSOL-multiphysics code. Results of simulation and the comparison with experiments performed at INFN-Legnaro National Laboratories with Ca beams are discussed.

  8. X-ray absorption spectroscopy of Mn doped ZnO thin films prepared by rf sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Yadav, Ashok Kumar; Jha, S. N.; Bhattacharyya, D., E-mail: dibyendu@barc.gov.in [Atomic & Molecular Physics Division, Bhabha Atomic Research Centre, Mumbai – 400 085 (India); Haque, Sk Maidul [Atomic & Molecular Physics Division, Bhabha Atomic Research Centre, VIZAG Centre, Visakhapatnam-530012 (India); Shukla, Dinesh; Choudhary, Ram Janay [UGC DAE Consortium for Scientific Research, Indore-452001 (India)

    2015-11-15

    A set of r.f. sputter deposited ZnO thin films prepared with different Mn doping concentrations have been characterised by Extended X-ray Absorption Fine Structure (EXAFS) and X-ray Absorption Near Edge Spectroscopy (XANES) measurements at Zn, Mn and O K edges and at Mn L{sub 2,3} edges apart from long range structural characterisation by Grazing Incident X-ray Diffraction (GIXRD) technique. Magnetic measurements show room temperature ferromagnetism in samples with lower Mn doping which is however, gets destroyed at higher Mn doping concentration. The results of the magnetic measurements have been explained using the local structure information obtained from EXAFS and XANES measurements.

  9. Preferential orientation growth of ITO thin film on quartz substrate with ZnO buffer layer by magnetron sputtering technique

    Science.gov (United States)

    Du, Wenhan; Yang, Jingjing; Xiong, Chao; Zhao, Yu; Zhu, Xifang

    2017-07-01

    In order to improve the photoelectric transformation efficiency of thin-film solar cells, one plausible method was to improve the transparent conductive oxides (TCO) material property. In-doped tin oxide (ITO) was an important TCO material which was used as a front contact layer in thin-film solar cell. Using magnetron sputtering deposition technique, we prepared preferential orientation ITO thin films on quartz substrate. XRD and SEM measurements were used to characterize the crystalline structure and morphology of ITO thin films. The key step was adding a ZnO thin film buffer layer before ITO deposition. ZnO thin film buffer layer increases the nucleation center numbers and results in the (222) preferential orientation growth of ITO thin films.

  10. Beaming teaching application: recording techniques for spatial xylophone sound rendering

    DEFF Research Database (Denmark)

    Markovic, Milos; Madsen, Esben; Olesen, Søren Krarup;

    2012-01-01

    BEAMING is a telepresence research project aiming at providing a multimodal interaction between two or more participants located at distant locations. One of the BEAMING applications allows a distant teacher to give a xylophone playing lecture to the students. Therefore, rendering of the xylophone...... played at student's location is required at teacher's site. This paper presents a comparison of different recording techniques for a spatial xylophone sound rendering. Directivity pattern of the xylophone was measured and spatial properties of the sound field created by a xylophone as a distributed sound...

  11. Chopper z-scan technique for elliptic Gaussian beams.

    Science.gov (United States)

    Dávila-Pintle, J A; Reynoso-Lara, E; Bravo-García, Y E

    2016-09-05

    This paper reports an improvement to the chopper z-scan technique for elliptic Gaussian beams. This improvement results in a higher sensitivity by measuring the ratio of eclipsing time to rotating period (duty cycle) of a chopper that eclipses the beam along the main axis. It is shown that the z-scan curve of the major axis is compressed along the z-axis. This compression factor is equal to the ratio between the minor and major axes. It was found that the normalized peak-valley difference with respect to the linear value does not depend on the axis along which eclipsing occurs.

  12. The structural transition from epitaxial Fe/Pt multilayers to an ordered FePt film using low energy ion beam sputtering deposition with no buffer layer

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Chih-Hao, E-mail: chlee@mx.nthu.edu.tw [Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Chen, Yu-Sheng [Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Electronics and Optoelectronics Research Laboratories, Industrial Technology Research Institute, Hsinchu 31040, Taiwan (China); Liu, Li-Jung [Department of Engineering and System Science, National Tsing Hua University, Hsinchu 30013, Taiwan (China); Huang, J.C.A. [Department of Physics, National Cheng Kung University, Tainan 70101, Taiwan (China)

    2014-11-03

    An epitaxial L1{sub 0} FePt thin film grown from an [Fe(10 Å)/Pt(10 Å)]{sub 15} multilayer with the orientation of (001) was prepared by an ion beam sputtering deposition method without buffer layer. From the measurement data of X-ray diffraction and X-ray reflectivity, the multilayer structure was totally disappeared and a uniform FePt alloy thin film was formed at temperatures higher than 600 °C. For the as-deposited thin film grown at 100 °C, the multilayer already possesses an epitaxial structure. The epitaxial relation is FePt(001)[100]//MgO(001)[100] and this epitaxial relation persists after sequential high temperature annealing. An epitaxial L1{sub 0} ordered FePt(001) film with order parameter of 0.95 was obtained when the annealing temperature reached 650 °C. The ordered FePt(001) thin film has a perpendicular magnetic anisotropy with a squareness of 0.95 ± 0.03 on the magnetic hysteresis loop. This experiment demonstrates that the low energy ion beam sputtering deposition will preserve the epitaxial relation with no buffer layer between multilayer and substrate. - Highlights: • The Fe/Pt films using ion sputtering deposition with no buffer layer is epitaxial. • Multilayer structure was totally disappeared at temperatures higher than 600 °C. • Order parameter reach 0.95 after annealing at 650 °C. • Interfacial epitaxial FePt alloy already formed at 100 °C.

  13. Photocatalytic efficiency of reusable ZnO thin films deposited by sputtering technique

    Science.gov (United States)

    Ahumada-Lazo, R.; Torres-Martínez, L. M.; Ruíz-Gómez, M. A.; Vega-Becerra, O. E.; Figueroa-Torres, M. Z.

    2014-12-01

    The photocatalytic activity of ZnO thin films with different physicochemical characteristics deposited by RF magnetron sputtering on glass substrate was tested for the decolorization of orange G dye aqueous solution (OG). The crystalline phase, surface morphology, surface roughness and the optical properties of these ZnO films were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), atomic force microscopy (AFM) and UV-visible spectroscopy (UV-Vis), respectively. The dye photodecolorization process was studied at acid, neutral and basic pH media under UV irradiation of 365 nm. Results showed that ZnO films grow with an orientation along the c-axis of the substrate and exhibit a wurtzite crystal structure with a (002) preferential crystalline orientation. A clear relationship between surface morphology and photocatalytic activity was observed for ZnO films. Additionally, the recycling photocatalytic abilities of the films were also evaluated. A promising photocatalytic performance has been found with a very low variation of the decolorization degree after five consecutive cycles at a wide range of pH media.

  14. Monte Carlo simulations of nanoscale Ne+ ion beam sputtering: investigating the influence of surface effects, interstitial formation, and the nanostructural evolution

    Science.gov (United States)

    Mahady, Kyle; Tan, Shida; Greenzweig, Yuval; Livengood, Richard; Raveh, Amir; Rack, Philip

    2017-01-01

    We present an updated version of our Monte-Carlo based code for the simulation of ion beam sputtering. This code simulates the interaction of energetic ions with a target, and tracks the cumulative damage, enabling it to simulate the dynamic evolution of nanostructures as material is removed. The updated code described in this paper is significantly faster, permitting the inclusion of new features, namely routines to handle interstitial atoms, and to reduce the surface energy as the structure would otherwise develop energetically unfavorable surface porosity. We validate our code against the popular Monte-Carlo code SRIM-TRIM, and study the development of nanostructures from Ne+ ion beam milling in a copper target.

  15. Effects of Additional Oxygen Flow on the Optical and Electrical Properties of Ion Beam Sputtering Deposited Molybdenum-Doped Zinc Oxide Layer

    Directory of Open Access Journals (Sweden)

    Chin-Chiuan Kuo

    2012-01-01

    Full Text Available The transparent conductive molybdenum-doped zinc oxide (MZO was deposited onto a flexible polyethersulfone (PES substrate by using an ion beam sputtering system. An argon ion beam was used to sputter an MZO target at constant pressure of 0.67 Pa and substrate temperature of 130∘C with varying the oxygen flow rate from 0 to 12 sccm. The influences of additional oxygen flow on the microstructure, optical, and electrical properties of films were investigated. The obtained MZO films present a crystalline structure. With increasing the oxygen flow rate, their electrical resistivity increases, and the optical band gap decreases from 3.46 to 3.20 eV. The film deposited in the atmosphere without introducing oxygen exhibits the best optical transmittance of 82.9% at 550 nm wavelength, electrical resistivity of 8.32 × 10−3 Ω cm, carrier concentration of 6.82 × 1020 cm−3, and carrier mobility of 2.45 cm2/Vs.

  16. The Post—deposition Anneal Effects on the Electrical Properties of HfO2 Gate Dielectric Deposited by Ion Beam Sputtering at Room Temperature

    Institute of Scientific and Technical Information of China (English)

    KANGJinfeng; LIUXiaoyan; TIANDayu; WANGWei; LIANGuijun; XIONGGuangcheng; HANRuqi

    2003-01-01

    HfO2 high K gate dielectric films were fab-ricated on p-Si(100) substrates by ion beam sputtering at room temperature followed by a post-deposition anneal-ing (PDA). The PDA effects on the electrical properties of HfO2 gate dielectric films were studied. High quality HfO2 gate dielectric with small equivalent oxide thickness (EOT = 2.3nm), small hystereis (△VFB<50mV), and lowleakage current (< 1× 10-4A/cm2@lV) was fabricated.The studies of PDA effects on the electrical properties in-dicate that the PDA process in nitrogen ambient will be necessary for the HfO2 gate dielectric films deposited by ion beam sputtering the sintered target at room temper-ature in order to obtain small equivalent oxide thickness and low leakage currents, whereas a PDA in oxygen ambi-ent will be not required. The results also means that there is less oxygen vacancy defect produced in the HfO2 gate dielectric films during the deposition at room temperature.

  17. Growth of the [110] oriented TiO2 nanorods on ITO substrates by sputtering technique for dye-sensitized solar cells

    Directory of Open Access Journals (Sweden)

    LIJIAN eMENG

    2014-09-01

    Full Text Available TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It has been found that the sputtering pressure is a very important parameter for the structure of the deposited TiO2 films. When the pressure is lower than 1 Pa, the deposited film has a dense structure and shows a preferred orientation along the [101] direction. However, the nanorod structure has been obtained as the sputtering pressure is higher than 1 Pa. These nanorods structure TiO2 film shows a preferred orientation along the [110] direction. The phases of the deposited TiO2 films have been characterized by the x-ray diffraction and the Raman scattering measurements. All the films show an anatase phase and no other phase has been observed. The results of the SEM show that these TiO2 nanorods are perpendicular to the ITO substrate. The TEM measurement shows that the nanorods have a very rough surface. The dye-sensitized solar cells (DSSCs have been assembled using these TiO2 nanorod films prepared at different sputtering pressures as photoelectrode. And the effect of the sputtering pressure on the properties of the photoelectric conversion of the DSSCs has been studied.

  18. Study of ion beam induced depolymerization using positron annihilation techniques

    Energy Technology Data Exchange (ETDEWEB)

    Puglisi, O. E-mail: opuglisi@dipchi.unict.it; Fragala, M.E.; Lynn, K.G.; Petkov, M.; Weber, M.; Somoza, A.; Dupasquier, A.; Quasso, F

    2001-04-01

    Ion beam induced depolymerization of polymers is a special class of ion beam induced chemical reaction which gives rise to catastrophic 'unzipping' of macromolecules with production of large amounts of the monomer, of the order of many hundreds monomer molecules per each macromolecule. The possible modification of the density at microscopic level prompted us to undertake a study of this effect utilizing positron annihilation techniques in Poly(methylmethacrylate) (PMMA) before and after bombardment with He{sup +} 300 keV ions at 200 deg. C. Preliminary results shown here indicate that before bombardment there is a reproducible dependence of nano-hole distribution on the sample history. Moreover at 200 deg. C we do not detect formation of new cavities as a consequence of the strong depolymerization that occurs under the ion beam. The possible correlation of these findings with transport properties of PMMA at temperature higher than the glass transition temperature will be discussed.

  19. Molecular depth profiling of organic photovoltaic heterojunction layers by ToF-SIMS: comparative evaluation of three sputtering beams

    NARCIS (Netherlands)

    Mouhib, T.; Poleunis, C.; Wehbe, N.; Michels, J.J.; Galagan, Y.; Houssiau, L.; Bertrand, P.; Delcorte, A.

    2013-01-01

    With the recent developments in secondary ion mass spectrometry (SIMS), it is now possible to obtain molecular depth profiles and 3D molecular images of organic thin films, i.e. SIMS depth profiles where the molecular information of the mass spectrum is retained through the sputtering of the sample.

  20. Photocatalytic efficiency of reusable ZnO thin films deposited by sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Ahumada-Lazo, R.; Torres-Martínez, L.M. [Universidad Autónoma de Nuevo León, Facultad de Ingeniería Civil, Departamento de Ecomateriales y Energía, Av. Universidad S/N Ciudad Universitaria, San Nicolás de los Garza, Nuevo León C.P. 66450, México (Mexico); Ruíz-Gómez, M.A. [Universidad Autónoma de Nuevo León, Facultad de Ingeniería Civil, Departamento de Ecomateriales y Energía, Av. Universidad S/N Ciudad Universitaria, San Nicolás de los Garza, Nuevo León C.P. 66450, México (Mexico); Departmento de Física Aplicada, CINVESTAV-IPN, Antigua Carretera a Progreso km 6, Mérida, Yucatán 97310, México (Mexico); Vega-Becerra, O.E. [Centro de Investigación en Materiales Avanzados S.C, Alianza norte 202, Parque de Investigación e Innovación Tecnológica, C.P. 66600 Apodaca Nuevo León, México (Mexico); and others

    2014-12-15

    Graphical abstract: - Highlights: • Decolorization of Orange G dye using highly c-axis-oriented ZnO thin films. • The flake-shaped film shows superior and stable photoactivity at a wide range of pH. • The highest photodecolorization was achieved at pH of 7. • The exposure of (101) and (100) facets enhanced the photoactivity. • ZnO thin films exhibit a promising performance as recyclable photocatalysts. - Abstract: The photocatalytic activity of ZnO thin films with different physicochemical characteristics deposited by RF magnetron sputtering on glass substrate was tested for the decolorization of orange G dye aqueous solution (OG). The crystalline phase, surface morphology, surface roughness and the optical properties of these ZnO films were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), atomic force microscopy (AFM) and UV–visible spectroscopy (UV–Vis), respectively. The dye photodecolorization process was studied at acid, neutral and basic pH media under UV irradiation of 365 nm. Results showed that ZnO films grow with an orientation along the c-axis of the substrate and exhibit a wurtzite crystal structure with a (002) preferential crystalline orientation. A clear relationship between surface morphology and photocatalytic activity was observed for ZnO films. Additionally, the recycling photocatalytic abilities of the films were also evaluated. A promising photocatalytic performance has been found with a very low variation of the decolorization degree after five consecutive cycles at a wide range of pH media.

  1. Innovative sputtering techniques for CIS and CdTe submodule fabrication. Annual subcontract report, 1 September 1991--31 August 1992

    Energy Technology Data Exchange (ETDEWEB)

    Armstrong, J.M.; Misra, M.S.; Lanning, B. [Martin Marietta Aerospace, Denver, CO (United States). Astronautics Group

    1993-03-01

    This report describes work done during Phase 1 of the subject subcontract. The subcontract was designed to study innovative deposition techniques, such as the rotating cylindrical magnetron sputtering system and electrodeposition for large-area, low-cost copper indium diselenide (CIS) and cadmium telluride (CdTe) devices. A key issue for photovoltaics (PV) in terrestrial and future space applications is producibility, particularly for applications using a large quantity of PV. Among the concerns for fabrication of polycrystalline thin-film PV, such as CIS and CdTe, are production volume, cost, and minimization of waste. Both rotating cylindrical magnetron (C-Mag{trademark}) sputtering and electrodeposition have tremendous potential for the fabrication of polycrystalline thin-film PV due to scaleability, efficient utilization of source materials, and inherently higher deposition rates. In the case of sputtering, the unique geometry of the C-Mae facilitates innovative cosputtering and reactive sputtering that could lead to greater throughput reduced health and safety risks, and, ultimately, lower fabrication cost. Electrodeposited films appear to be adherent and comparable with low-cost fabrication techniques. Phase I involved the initial film and device fabrication using the two techniques mentioned herein. Devices were tested by both internal facilities, as well as NREL and ISET.

  2. Beam-shaping technique for improving the beam quality of a high-power laser-diode stack.

    Science.gov (United States)

    Gao, Xin; Ohashi, Hiroyuki; Okamoto, Hiroshi; Takasaka, Masaomi; Shinoda, Kazunori

    2006-06-01

    We report a beam-shaping technique that reconfigures the beams to improve the beam quality and enhance the power density for a ten-array high-power laser-diode stack by using two optical rectangular cubes and two stripe-mirror plates. The reshaped beam has threefold improvement in beam quality, and its power density is effectively enhanced. On the basis of this technique, we focus the beam of the high-power laser-diode stack to effectively end pump a high-power fiber laser.

  3. Optical fiber sensors fabricated by the focused ion beam technique

    DEFF Research Database (Denmark)

    Yuan, Scott Wu; Wang, Fei; Bang, Ole

    2012-01-01

    crystal fiber (PCF). Using this technique we fabricate a highly compact fiber-optic Fabry-Pérot (FP) refractive index sensor near the tip of fiber taper, and a highly sensitive in-line temperature sensor in PCF. We also demonstrate the potential of using FIB to selectively fill functional fluid......Focused ion beam (FIB) is a highly versatile technique which helps to enable next generation of lab-on-fiber sensor technologies. In this paper, we demonstrate the use application of FIB to precisely mill the fiber taper and end facet of both conventional single mode fiber (SMF) and photonic...

  4. Origin of the energetic ion beams at the substrate generated during high power pulsed magnetron sputtering of titanium

    CERN Document Server

    Maszl, Christian; Benedikt, Jan; von Keudell, Achim

    2013-01-01

    High power pulsed magnetron sputtering (HiPIMS) plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these energetic ions in HiPIMS is still an open issue, which is unraveled by using three fast diagnostics: time resolved mass spectrometry with a temporal resolution of 2 $\\mu$s, phase resolved optical emission spectroscopy with 1 $\\mu$s and the rotating shutter experiment with a resolution of 50 $\\mu$s. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2-inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well in the energetic properties of Ar$^+$, Ar$^{2+}$, Ti$^+$ and Ti$^{2+}$ were observed. For discharges with highest peak power densities a high energetic group of Ti$^{+}$ and Ti$^{2+}$ could be identified. A cold group of ions is always present. It is found that hot ions are observed only, when the plasma enters the spokes regime, ...

  5. Textured surface structures formed using new techniques on transparent conducting Al-doped zinc oxide films prepared by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Minami, Tadatsugu [Optoelectronic Device System R& D Center, Kanazawa Institute of Technology, Nonoichi, Ishikawa 921-8501 (Japan); Miyata, Toshihiro, E-mail: tmiyata@neptune.kanazawa-it.ac.jp [Optoelectronic Device System R& D Center, Kanazawa Institute of Technology, Nonoichi, Ishikawa 921-8501 (Japan); Uozaki, Ryousuke [Optoelectronic Device System R& D Center, Kanazawa Institute of Technology, Nonoichi, Ishikawa 921-8501 (Japan); Sai, Hitoshi; Koida, Takashi [Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568 (Japan)

    2016-09-01

    Surface-textured Al-doped ZnO (AZO) films formed using two new techniques based on magnetron sputtering deposition were developed by optimizing the light scattering properties to be suitable for transparent electrode applications in thin-film silicon solar cells. Scrambled egg-like surface-textured AZO films were prepared using a new texture formation technique that post-etched pyramidal surface-textured AZO films prepared under deposition conditions suppressing c-axis orientation. In addition, double surface-textured AZO films were prepared using another new texture formation technique that completely removed, by post-etching, the pyramidal surface-textured AZO films previously prepared onto the initially deposited low resistivity AZO films; simultaneously, the surface of the low resistivity films was slightly etched. However, the obtained very high haze value in the range from the near ultraviolet to visible light in the scrambled egg-like surface-textured AZO films did not contribute significantly to the obtainable photovoltaic properties in the solar cells fabricated using the films. Significant light scattering properties as well as a low sheet resistance could be achieved in the double surface-textured AZO films. In addition, a significant improvement of external quantum efficiency in the range from the near ultraviolet to visible light was achieved in superstrate-type n-i-p μc-Si:H solar cells fabricated using a double surface-textured AZO film prepared under optimized conditions as the transparent electrode. - Highlights: • Double surface-textured AZO films prepared using a new texture formation technique • Extensive light scattering properties with low sheet resistance achieved in the double surface-textured AZO films • Improved external quantum efficiency of μc-Si:H solar cells using a double surface-textured AZO film.

  6. Dual self-image technique for beam collimation

    Science.gov (United States)

    Herrera-Fernandez, Jose Maria; Sanchez-Brea, Luis Miguel; Torcal-Milla, Francisco Jose; Morlanes, Tomas; Bernabeu, Eusebio

    2016-07-01

    We propose an accurate technique for obtaining highly collimated beams, which also allows testing the collimation degree of a beam. It is based on comparing the period of two different self-images produced by a single diffraction grating. In this way, variations in the period of the diffraction grating do not affect to the measuring procedure. Self-images are acquired by two CMOS cameras and their periods are determined by fitting the variogram function of the self-images to a cosine function with polynomial envelopes. This way, loss of accuracy caused by imperfections of the measured self-images is avoided. As usual, collimation is obtained by displacing the collimation element with respect to the source along the optical axis. When the period of both self-images coincides, collimation is achieved. With this method neither a strict control of the period of the diffraction grating nor a transverse displacement, required in other techniques, are necessary. As an example, a LED considering paraxial approximation and point source illumination is collimated resulting a resolution in the divergence of the beam of δ φ =+/- 1.57 μ {rad}.

  7. Self-organised silicide nanodot patterning by medium-energy ion beam sputtering of Si(100): local correlation between the morphology and metal content

    Science.gov (United States)

    Redondo-Cubero, A.; Galiana, B.; Lorenz, K.; Palomares, FJ; Bahena, D.; Ballesteros, C.; Hernandez-Calderón, I.; Vázquez, L.

    2016-11-01

    We have produced self-organised silicide nanodot patterns by medium-energy ion beam sputtering (IBS) of silicon targets with a simultaneous and isotropic molybdenum supply. Atomic force microscopy (AFM) studies show that these patterns are qualitatively similar to those produced thus far at low ion energies. We have determined the relevance of the ion species on the pattern ordering and properties. For the higher ordered patterns produced by Xe+ ions, the pattern wavelength depends linearly on the ion energy. The dot nanostructures are silicide-rich as assessed by x-ray photoelectron spectroscopy (XPS) and emerge in height due to their lower sputtering yield, as observed by electron microscopy. Remarkably, a long wavelength corrugation is observed on the surface which is correlated with both the Mo content and the dot pattern properties. Thus, as assessed by electron microscopy, the protrusions are Mo-rich with higher and more spaced dots on their surface whereas the valleys are Mo-poor with smaller dots that are closer to each other. These findings indicate that there is a correlation between the local metal content of the surface and the nanodot pattern properties both at the nanodot and the large corrugation scales. These results contribute to advancing the understanding of this interesting nanofabrication method and aid in developing a comprehensive theory of nanodot pattern formation and evolution.

  8. Self-organised silicide nanodot patterning by medium-energy ion beam sputtering of Si(100): local correlation between the morphology and metal content.

    Science.gov (United States)

    Redondo-Cubero, A; Galiana, B; Lorenz, K; Palomares, F J; Bahena, D; Ballesteros, C; Hernandez-Calderón, I; Vázquez, L

    2016-11-01

    We have produced self-organised silicide nanodot patterns by medium-energy ion beam sputtering (IBS) of silicon targets with a simultaneous and isotropic molybdenum supply. Atomic force microscopy (AFM) studies show that these patterns are qualitatively similar to those produced thus far at low ion energies. We have determined the relevance of the ion species on the pattern ordering and properties. For the higher ordered patterns produced by Xe(+) ions, the pattern wavelength depends linearly on the ion energy. The dot nanostructures are silicide-rich as assessed by x-ray photoelectron spectroscopy (XPS) and emerge in height due to their lower sputtering yield, as observed by electron microscopy. Remarkably, a long wavelength corrugation is observed on the surface which is correlated with both the Mo content and the dot pattern properties. Thus, as assessed by electron microscopy, the protrusions are Mo-rich with higher and more spaced dots on their surface whereas the valleys are Mo-poor with smaller dots that are closer to each other. These findings indicate that there is a correlation between the local metal content of the surface and the nanodot pattern properties both at the nanodot and the large corrugation scales. These results contribute to advancing the understanding of this interesting nanofabrication method and aid in developing a comprehensive theory of nanodot pattern formation and evolution.

  9. Ion beam analysis techniques applied to large scale pollution studies

    Energy Technology Data Exchange (ETDEWEB)

    Cohen, D.D.; Bailey, G.; Martin, J.; Garton, D.; Noorman, H.; Stelcer, E.; Johnson, P. [Australian Nuclear Science and Technology Organisation, Lucas Heights, NSW (Australia)

    1993-12-31

    Ion Beam Analysis (IBA) techniques are ideally suited to analyse the thousands of filter papers a year that may originate from a large scale aerosol sampling network. They are fast multi-elemental and, for the most part, non-destructive so other analytical methods such as neutron activation and ion chromatography can be performed afterwards. ANSTO in collaboration with the NSW EPA, Pacific Power and the Universities of NSW and Macquarie has established a large area fine aerosol sampling network covering nearly 80,000 square kilometres of NSW with 25 fine particle samplers. This network known as ASP was funded by the Energy Research and Development Corporation (ERDC) and commenced sampling on 1 July 1991. The cyclone sampler at each site has a 2.5 {mu}m particle diameter cut off and runs for 24 hours every Sunday and Wednesday using one Gillman 25mm diameter stretched Teflon filter for each day. These filters are ideal targets for ion beam analysis work. Currently ANSTO receives 300 filters per month from this network for analysis using its accelerator based ion beam techniques on the 3 MV Van de Graaff accelerator. One week a month of accelerator time is dedicated to this analysis. Four simultaneous accelerator based IBA techniques are used at ANSTO, to analyse for the following 24 elements: H, C, N, O, F, Na, Al, Si, P, S, Cl, K, Ca, Ti, V, Cr, Mn, Fe, Cu, Ni, Co, Zn, Br and Pb. The IBA techniques were proved invaluable in identifying sources of fine particles and their spatial and seasonal variations accross the large area sampled by the ASP network. 3 figs.

  10. Introduction to focused ion beams instrumentation, theory, techniques and practice

    CERN Document Server

    Giannuzzi, Lucille A

    2005-01-01

    The focused ion beam (FIB) instrument has experienced an intensive period of maturation since its inception. Numerous new techniques and applications have been brought to fruition, and over the past few years, the FIB has gained acceptance as more than just an expensive sample preparation tool. It has taken its place among the suite of other instruments commonly available in analytical and forensic laboratories, universities, geological, medical and biological research institutions, and manufacturing plants. Although the utility of the FIB is not limited to the preparation of specimens for subsequent analysis by other analytical techniques, it has revolutionized the area of TEM specimen preparation. The FIB has also been used to prepare samples for numerous other analytical techniques, and offers a wide range of other capabilities. While the mainstream of FIB usage remains within the semiconductor industry, FIB usage has expanded to applications in metallurgy, ceramics, composites, polymers, geology, art, bio...

  11. The Influences of Thickness on the Optical and Electrical Properties of Dual-Ion-Beam Sputtering-Deposited Molybdenum-Doped Zinc Oxide Layer

    Directory of Open Access Journals (Sweden)

    Chin-Chiuan Kuo

    2011-01-01

    Full Text Available The thickness of transparent conductive oxide (TCO layer significantly affects not only the optical and electrical properties, but also its mechanical durability. To evaluate these influences on the molybdenum-doped zinc oxide layer deposited on a flexible polyethersulfone (PES substrate by using a dual-ion-beam sputtering system, films with various thicknesses were prepared at a same condition and their optical and electrical performances have been compared. The results show that all the deposited films present a crystalline wurtzite structure, but the preferred orientation changes from (002 to (100 with increasing the film thickness. Thicker layer contains a relative higher carrier concentration, but the consequently accumulated higher internal stress might crack the film and retard the carrier mobility. The competition of these two opposite trends for carrier concentration and carrier mobility results in that the electrical resistivity of molybdenum-doped zinc oxide first decreases with the thickness but suddenly rises when a critical thickness is reached.

  12. Ion-beam mixed ultra-thin cobalt suicide (CoSi2) films by cobalt sputtering and rapid thermal annealing

    Science.gov (United States)

    Kal, S.; Kasko, I.; Ryssel, H.

    1995-10-01

    The influence of ion-beam mixing on ultra-thin cobalt silicide (CoSi2) formation was investigated by characterizing the ion-beam mixed and unmixed CoSi2 films. A Ge+ ion-implantation through the Co film prior to silicidation causes an interface mixing of the cobalt film with the silicon substrate and results in improved silicide-to-silicon interface roughness. Rapid thermal annealing was used to form Ge+ ion mixed and unmixed thin CoSi2 layer from 10 nm sputter deposited Co film. The silicide films were characterized by secondary neutral mass spectroscopy, x-ray diffraction, tunneling electron microscopy (TEM), Rutherford backscattering, and sheet resistance measurements. The experi-mental results indicate that the final rapid thermal annealing temperature should not exceed 800°C for thin (<50 nm) CoSi2 preparation. A comparison of the plan-view and cross-section TEM micrographs of the ion-beam mixed and unmixed CoSi2 films reveals that Ge+ ion mixing (45 keV, 1 × 1015 cm-2) produces homogeneous silicide with smooth silicide-to-silicon interface.

  13. New diagnostic technique for Zeeman-compensated atomic beam slowing: technique and results

    NARCIS (Netherlands)

    Molenaar, P.A.; Straten, P. van der; Heideman, H.G.M.; Metcalf, H.

    2001-01-01

    We have developed a new diagnostic tool for the study of Zeeman-compensated slowing of an alkali atomic beam. Our time-of-flight technique measures the longitudinal veloc- ity distribution of the slowed atoms with a resolution below the Doppler limit of 30 cm/s. Furthermore, it can map the position

  14. Growth of Co2FeAl Heusler alloy thin films on Si(100) having very small Gilbert damping by Ion beam sputtering.

    Science.gov (United States)

    Husain, Sajid; Akansel, Serkan; Kumar, Ankit; Svedlindh, Peter; Chaudhary, Sujeet

    2016-06-30

    The influence of growth temperature Ts (300-773 K) on the structural phase ordering, static and dynamic magnetization behaviour has been investigated in ion beam sputtered full Heusler alloy Co2FeAl (CFA) thin films on industrially important Si(100) substrate. The B2 type magnetic ordering is established in these films based on the clear observation of the (200) diffraction peak. These ion beam sputtered CFA films possess very small surface roughness of the order of subatomic dimensions (<3 Å) as determined from the fitting of XRR spectra and also by AFM imaging. This is supported by the occurrence of distinct Kiessig fringes spanning over the whole scanning range (~4°) in the x-ray reflectivity (XRR) spectra. The Gilbert damping constant α and effective magnetization 4πMeff are found to vary from 0.0053 ± 0.0002 to 0.0015 ± 0.0001 and 13.45 ± 00.03 kG to 14.03 ± 0.04 kG, respectively. These Co2FeAl films possess saturation magnetization ranging from 4.82 ± 0.09 to 5.22 ± 0.10 μB/f.u. consistent with the bulk L21-type ordering. A record low α-value of 0.0015 is obtained for Co2FeAl films deposited on Si substrate at Ts ~ 573 K.

  15. Cupric and cuprous oxide by reactive ion beam sputter deposition and the photosensing properties of cupric oxide metal–semiconductor–metal Schottky photodiodes

    Energy Technology Data Exchange (ETDEWEB)

    Hong, Min-Jyun; Lin, Yong-Chen; Chao, Liang-Chiun, E-mail: lcchao@mail.ntust.edu.tw; Lin, Pao-Hung; Huang, Bohr-Ran

    2015-08-15

    Highlights: • CuO and Cu{sub 2}O were deposited by reactive ion beam sputter deposition. • Single phase CuO thin film is obtained with Ar:O{sub 2} = 2:1. • CuO MSM PD shows photoresponse from 400 nm to 1.30 μm. • CuO MSM PD is RC limited with a decay time less than 1 μs. - Abstract: Cupric (CuO) and cuprous (Cu{sub 2}O) oxide thin films have been deposited by reactive ion beam sputter deposition at 400 °C with an Ar:O{sub 2} ratio from 2:1 to 12:1. With an Ar:O{sub 2} ratio of 2:1, single phase polycrystalline CuO thin films were obtained. Decreasing oxygen flow rate results in CuO + Cu{sub 2}O and Cu{sub 2}O + Cu mixed thin films. As Ar:O{sub 2} ratio reaches 12:1, Cu{sub 2}O nanorods with diameter of 250 nm and length longer than 1 μm were found across the sample. Single phase CuO thin film exhibits an indirect band gap of 1.3 eV with a smooth surface morphology. CuO metal–semiconductor–metal (MSM) Schottky photodiodes (PD) were fabricated by depositing Cu interdigitated electrodes on CuO thin films. Photosensing properties of the CuO PD were characterized from 350 to 1300 nm and a maximum responsivity of 43 mA/W was found at λ = 700 nm. The MSM PD is RC limited with a decay time constant less than 1 μs.

  16. Ion Beam Analysis, structure and corrosion studies of nc-TiN/a-Si{sub 3}N{sub 4} nanocomposite coatings deposited by sputtering on AISI 316L

    Energy Technology Data Exchange (ETDEWEB)

    García, J. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jal. 45101 (Mexico); Canto, C.E. [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, México, D.F. 04510 (Mexico); Flores, M. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jal. 45101 (Mexico); Andrade, E., E-mail: andrade@fisica.unam.mx [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, México, D.F. 04510 (Mexico); Rodríguez, E.; Jiménez, O. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jal. 45101 (Mexico); Solis, C.; Lucio, O.G. de [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, México, D.F. 04510 (Mexico); Rocha, M.F. [ESIME-Z, Instituto Politécnico Nacional, ALM Zacatenco, México, D.F. 07738 (Mexico)

    2014-07-15

    In this work, nanocomposite coatings of nc-TiN/a-Si{sub 3}N{sub 4}, were deposited on AISI 316L stainless steel substrate by a DC and RF reactive magnetron co-sputtering technique using an Ar–N{sub 2} plasma. The structure of the coatings was characterized by means of XRD (X-ray Diffraction). The substrate and coating corrosion resistance were evaluated by potentiodynamic polarization using a Ringer solution as electrolyte. Corrosion tests were conducted with the purpose to evaluate the potential of this coating to be used on biomedical alloys. IBA (Ion Beam Analysis) techniques were applied to measure the elemental composition profiles of the films and, XPS (X-ray Photoelectron Spectroscopy) were used as a complementary technique to obtain information about the compounds present in the films. The nanocomposite coatings of nc-TiN/a-Si{sub 3}N{sub 4} show crystalline (TiN) and amorphous (Si{sub 3}N{sub 4}) phases which confer a better protection against the corrosion effects compared with that of the AISI 316L.

  17. New approaches for investigating paintings by ion beam techniques

    Energy Technology Data Exchange (ETDEWEB)

    Beck, L., E-mail: Lucile.beck@cea.f [Centre de Recherche et de Restauration des Musees de France (C2RMF), CNRS-UMR 171, Palais du Louvre - Porte des Lions, 14 quai Francois Mitterrand, 75001 Paris (France); Viguerie, L. de; Walter, Ph.; Pichon, L. [Centre de Recherche et de Restauration des Musees de France (C2RMF), CNRS-UMR 171, Palais du Louvre - Porte des Lions, 14 quai Francois Mitterrand, 75001 Paris (France); Gutierrez, P.C. [Centro de Micro-Analisis de Materiales (CMAM), Universidad Autonoma de Madrid, Campus de Cantoblanco, E-28049 Madrid (Spain); Salomon, J.; Menu, M. [Centre de Recherche et de Restauration des Musees de France (C2RMF), CNRS-UMR 171, Palais du Louvre - Porte des Lions, 14 quai Francois Mitterrand, 75001 Paris (France); Sorieul, S. [Centre d' Etudes Nucleaires de Bordeaux-Gradignan, IN2P3, UMR 5797, Universite de Bordeaux 1, Chemin du Solarium BP120, 33175 Gradignan Cedex (France)

    2010-06-15

    Up to now, among the IBA techniques, only PIXE has been used for analyzing paintings. However, quantitative PIXE analysis is sometimes difficult to interpret due to the layered structure, the presence of varnish and organic binder and, in some cases, discoloration of the pigments has been observed due to the interaction of the ion beam with the compounds. In order to improve the characterization of paintings, we propose some alternative experimental procedures. First of all, backscattering spectrometry (BS) and PIXE are simultaneously combined in order to collect complementary information such as layer thickness and organic compound quantification. The simultaneous PIXE and BS experiments also have the advantage of being able to analyze the same area in one experiment. This combination, implemented with an external beam, was directly applied on paintings and on painting cross-sections for the study of Italian Renaissance masterpieces. We have obtained valuable results not only on the pigment itself but also, for the first time, on the binder to pigment proportion which is not well documented in the ancient recipes. Moreover, in order to restrain beam damages due to the ion stopping power, we propose to analyze very thin painting cross-sections by a combination of PIXE-RBS and Scanning Transmission Ion Microscopy (STIM).

  18. Monitoring corrosion in prestressed concrete beams using acoustic emission technique

    Science.gov (United States)

    ElBatanouny, Mohamed K.; Mangual, Jesé; Vélez, William; Ziehl, Paul H.; Matta, Fabio; González, Miguel

    2012-04-01

    Early detection of corrosion can help reduce the cost of maintenance and extend the service life of structures. Acoustic emission (AE) sensing has proven to be a promising method for early detection of corrosion in reinforced concrete members. A test program is presented composed of four medium-scale prestressed concrete T-beams. Three of the beams have a length of 16 ft. 4 in. (4.98 m), and one is 9 ft. 8 in. (2.95 m). In order to corrode the specimens a 3% NaCl solution was prepared, which is representative of sea salt concentration. The beams were subjected to wet-dry cycles to accelerate the corrosion process. Two of the specimens were pre-cracked prior to conditioning in order to examine the effect of crack presence. AE data was recorded continuously while half-cell potential measurements and corrosion rate by Linear Polarization Resistance (LPR) were measured daily. Corrosion current was also being acquired constantly to monitor any change in the concrete resistivity. Results indicate that the onset of corrosion may be identified using AE features, and were corroborated with measurements obtained from electrochemical techniques. Corroded areas were located using source triangulation. The results indicate that cracked specimens showed corrosion activity prior to un-cracked specimens and experienced higher corrosion rates. The level of corrosion was determined using corrosion rate results. Intensity analysis was used to link the corrosion rate and level to AE data.

  19. Neutral atom beam technique enhances bioactivity of PEEK

    Energy Technology Data Exchange (ETDEWEB)

    Khoury, Joseph, E-mail: jkhoury@exogenesis.us [Exogenesis Corporation, Billerica, MA 01821 (United States); Kirkpatrick, Sean R.; Maxwell, Melissa; Cherian, Raymond E.; Kirkpatrick, Allen; Svrluga, Richard C. [Exogenesis Corporation, Billerica, MA 01821 (United States)

    2013-07-15

    Polyetheretherketone (PEEK) is currently gaining popularity in orthopedic and spinal applications but has potential drawbacks in use. PEEK is biocompatible, similar in elasticity to bone, and radiolucent; however, it has been shown to be inert and does not integrate well with bone. Recent efforts have focused on increasing the bioactivity of PEEK by modifying the surface to improve the bone-implant interface. We have employed a novel Accelerated Neutral Atom Beam technique (ANAB) to enhance the bioactivity of PEEK. ANAB employs an intense beam of cluster-like packets of accelerated unbonded neutral argon (Ar) gas atoms. These beams are created by first producing a highly energetic Gas Cluster Ion Beam (GCIB) comprised of van der Waals bonded Ar atoms, then transferring energy to the clusters so as to cause release of most of the interatomic bonds, and finally deflecting away the remaining electrically charged cluster cores of still bonded atoms. We identified that ANAB treatment of PEEK results in nanometer scale surface modifications as well as increased surface hydrophilicity. Human osteoblasts seeded onto the surface of ANAB-treated PEEK exhibited enhanced growth as compared to control PEEK as evidenced by cell proliferation assays and microscopy. This increase in bioactivity resulted in cell proliferation levels comparable to native titanium. An in vivo study using a rat calvarial critical size defect model revealed enhanced osseointegration where bone tissue formation was evident only on the ANAB treated PEEK. Taken together, these data suggest that ANAB treatment of PEEK has the potential to enhance its bioactivity, resulting in bone formation and significantly decreasing osseointegration time of orthopedic and spinal implants.

  20. A combined molecular dynamics and kinetic Monte Carlo calculation to study sputter erosion and beam assisted deposition

    CERN Document Server

    Betz, G

    2002-01-01

    To extend the time scale in molecular dynamics (MD) calculations of sputtering and ion assisted deposition we have coupled our MD calculations to a kinetic Monte Carlo (KMC) calculation. In this way we have studied surface erosion of Cu(1 0 0) under 200-600 eV Cu ion bombardment and growth of Cu on Cu(1 0 0) for deposition at thermal energies up to energies of 100 eV per atom. Target temperatures were varied from 100 to 400 K. The coupling of the MD calculation to a KMC calculation allows us to extend our calculations from a few ps, a time scale typical for MD, to times of up to seconds until the next Cu particle will impinge/be deposited on the crystal surface of about 100 nm sup 2 in size. The latter value of 1 s is quite realistic for a typical experimental sputter erosion or deposition experiment. In such a calculation thermal diffusion processes at the surface and annealing of the surface after energetic ion bombardment can be taken into account. To achieve homo-epitaxial growth of a film the results cle...

  1. Effects of oxygen addition in reactive cluster beam deposition of tungsten by magnetron sputtering with gas aggregation

    Energy Technology Data Exchange (ETDEWEB)

    Polášek, J., E-mail: xpolasekj@seznam.cz [Department of Surface and Plasma Science, Faculty of Mathematics and Physic, Charles University, V Holešovičkách 2, Prague 8, CZ-18000 (Czech Republic); Mašek, K. [Department of Surface and Plasma Science, Faculty of Mathematics and Physic, Charles University, V Holešovičkách 2, Prague 8, CZ-18000 (Czech Republic); Marek, A.; Vyskočil, J. [HVM Plasma Ltd., Na Hutmance 2, Prague 5, CZ-158 00 (Czech Republic)

    2015-09-30

    In this work, we investigated the possibilities of tungsten and tungsten oxide nanoclusters generation by means of non-reactive and reactive magnetron sputtering with gas aggregation. It was found that in pure argon atmosphere, cluster aggregation proceeded in two regimes depending on argon pressure in the aggregation chamber. At the lower pressure, cluster generation was dominated by two-body collisions yielding larger clusters (about 5.5 nm in diameter) at lower rate. At higher pressures, cluster generation was dominated by three-body collisions yielding smaller clusters (3–4 nm in diameter) at higher rate. The small amount of oxygen admixture in the aggregation chamber had considerable influence on cluster aggregation process. At certain critical pressure, the presence of oxygen led to the raise of deposition rate and cluster size. Resulting clusters were composed mostly of tungsten trioxide. The oxygen pressure higher than critical led to the target poisoning and the decrease in the sputtering rate. Critical oxygen pressure decreased with increasing argon pressure, suggesting that cluster aggregation process was influenced by atomic oxygen species (namely, O{sup −} ion) generated by oxygen–argon collisions in the magnetron plasma. - Highlights: • Formation of tungsten and tungsten oxide clusters was observed. • Two modes of cluster aggregation in pure argon atmosphere were found. • Dependence of cluster deposition speed and size on oxygen admixture was observed. • Changes of dependence on oxygen with changing argon pressure were described.

  2. Electrical and optical properties of hydrogenated amorphous silicon-germanium (a-Si1 - xGexH) films prepared by reactive ion beam sputtering

    Science.gov (United States)

    Bhan, Mohan Krishan; Malhotra, L. K.; Kashyap, Subhash C.

    1989-09-01

    Thin films of hydrogenated amorphous silicon-germanium (a-Si1-xGex: H) alloys have been prepared by reactive ion beam sputtering of a composite target of silicon and germanium. The dependence of the deposition rate, conductivity-temperature variation, optical absorption coefficient, refractive index, imaginary part of the dielectric constant, hydrogen content, and infrared (IR) absorption spectra on germanium content (x) are reported and analyzed. For a typical composition—a-Si28Ge72:H (x=0.72), the effect of beam voltage, H2:Ar flow ratio, and substrate temperature on the material properties have also been investigated. For the films prepared with increasing x, the expected behavior of a decrease in both hydrogen content and band gap and an increase in the electrical conductivity have been observed. The films prepared at x>0.80 are found to be more homogeneous than the films deposited at 0.0disorder introduced by the random mixing of Si and Ge atoms in the a-Si1-xGex: H network in the latter case. The a-Si28Ge72:H films exhibiting minimum conductivity (1.7×10-7 Ω-1 cm-1) have been obtained for an H2:Ar flow ratio of 10:1 and a beam voltage and substrate temperature of 1500 V and 300 °C, respectively. These films contain a hydrogen concentration of 10.2 at. % and show an optical band gap of 1.25 eV. The IR studies have shown that a-Si28Ge72:H films prepared both at low beam voltages and at low substrate temperatures show the unusual preferential attachment of hydrogen to Ge rather than to Si.

  3. Comparative microstructure and electrical property studies of lead scandium tantalate thin films as prepared by LDCVD, sol-gel and sputtering techniques

    Science.gov (United States)

    Huang, Z.; Donohue, P. P.; Zhang, Q.; Williams, D. J.; Anthony, C. J.; Whatmore, R. W.; Todd, M. A.

    2003-02-01

    Lead scandium tantalate (PST) thin films for uncooled infrared (IR) detector applications have been deposited by liquid delivery chemical vapour deposition (LDCVD), sputtering and sol-gel techniques. The sol-gel and sputtered films were deposited at low temperature into a non-ferroelectric phase with the required perovskite structure being formed using a high temperature rapid thermal anneal (RTA). In contrast to this, the LDCVD films were deposited at high temperature directly into the perovskite phase but were found to still require a high temperature RTA step to optimize their merit for IR detection. Detailed structural and electrical characterization of the PST films deposited by these different methods have revealed that there is no simple relationship between microstructure and electrical properties. The sol-gel and LDCVD techniques produce thin films with excellent microstructures, as determined by x-ray diffraction analysis and transmission electron microscopy, but inferior electrical properties and relatively low merit figures. By contrast, the sputtered and then rapid thermal annealed films have inferior microstructures, characterized by extensive voiding, but excellent electrical properties and high merit figures.

  4. XANES and EXAFS study of the TiN Thin films grown by the pulsed DC sputtering technique assisted by balanced magnetron

    Energy Technology Data Exchange (ETDEWEB)

    Duarte M, A.; Esparza P, H.; Gonzalez V, C. [Centro de Investigacion en Materiales Avanzados, S. C., Miguel de Cervantes 120, Complejo Industrial Chihuahua Chihuahua, Chih. 31109 (Mexico); Yocupicio, I. [Universidad de Sonora, Unidad Regional Sur Lazaro Cardenas No. 100 Col. Fco. Villa, Navojoa, Sonora (Mexico)

    2007-07-01

    A series of different Ti{sub x}N{sub y} thin films were grown by the DC-sputtering technique. The purpose for this work was to study through XAS interpretation, how the different amounts of N{sub 2} during growing thin TiN thin films, affects the stoichiometry of the TiN deposited. Also the results obtained determinate how to interpret the spectra to see the different valences of Ti in TiN, are working. The results were supported with the EXAFS and XANES analysis. This work concludes the adequate conditions for this experiment to obtain TiN as thin film by the DC sputtering assisted by pulsed balanced magnetron at room temperature and concludes which XANES spectra are the finger print for valences of Ti. (Author)

  5. Large area superconducting YBa sub 2 Cu sub 3 O sub 7-x films grown by single target ion beam sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Gauzzi, A.; Lucia, M.L.; Kellett, B.J.; James, J.H.; Pavuna, D. (Inst. of Micro- and Optoelectronics, Swiss Federal Inst. of Tech., Lausanne (Switzerland))

    1991-10-20

    We have demonstrated, by using a simple single YBa{sub 2}Cu{sub 3}O{sub 7-x} target ion beam system that, with a sufficiently low power ion beam, preferential sputtering is avoided and high-quality YBa{sub 2}Cu{sub 3}O{sub 7-x} films are deposited over areas larger than {approx equal}30 cm{sup 2} in a reproducible way. As-deposited films on <100>SrTiO{sub 3} are 50-100 nm thick, c-oriented and show the following reproducible electrical properties (within the given variations): Tc{sub 0}=90{+-}0.5 K, transitions widths less than 1 K, j{sub c}(77K)=1.0-1.2x10{sup 6} A cm{sup -2}, {rho}(300K)=300{+-}50 {mu}{Omega} cm, {rho}(300 K)/{rho}(100 K)=2.9{+-}0.1. The extrapolated residual resistivity {rho}{sub res}(0 K) is between 0 and 5% of {rho}(300 K). (orig.).

  6. Alternative Shapes and Shaping Techniques for Enhanced Transformer Ratios in Beam Driven Techniques

    Energy Technology Data Exchange (ETDEWEB)

    Lemery, F. [Northern Illinois U.; Piot, P. [Fermilab

    2014-01-01

    The transformer ration of collinear beam-driven techniques can be significantly improved by shaping the current profile of the drive bunch. To date, several current shapes have been proposed to increase the transformer ratio and produce quasi-uniform energy loss within the drive bunch. Some of these tailoring techniques are possible as a results of recent beam-dynamics advances, e.g., transverse-to-longitudinal emittance exchanger. In ths paper, we propose an alternative class of longitudinal shapes that enable high transformer ratio and uniform energy loss across the drive bunch. We also suggest a simple method based on photocathode-laser shaping and passive shaping in wakefield structure to realize shape close to the theoretically optimized current profiles.

  7. Comparative Study on Flexural Strengthening of RC Beams using CFRP Laminate by Different Techniques

    Science.gov (United States)

    Jeevan, N.; Jagannatha Reddy, H. N.

    2017-08-01

    This paper presents a detailed study on flexural behaviour of RC beams strengthened using Carbon Fiber Reinforced Polymer (CFRP) laminate. A detailed study was made on strengthened beam using Externally Bonded Laminate (EBL) and Internally Bonded Laminate (IBL) techniques. In IBL technique the laminate is sandwiched between the layers of epoxy mounted on the cover portion by the groove. The beams were designed as under-reinforced section. Totally six beams were casted, out of this two beams were control beams. Strengthened beams were divided into two sets (IBL and EBL) of two beams each. The main aim of this work is to delay the debonding failure in order to enhance the ultimate load carrying capacity for strengthened beams. Four-point bending flexural tests were conducted on specimens up to failure. The experimental results illustrate that, the strengthened beams significantly increases the cracking, working and ultimate load when compared with control beams. IBL technique shows the significant increase in the debonding strain by delaying the beam from debonding failure which in turn enhances the ultimate load by almost 73% compared with control beam and 39% with EBL technique. All the deflection values from the experiments are within the limit of codal provisions. The IBL technique was emerged as the better strengthening technique, which increases almost 41% of working load (Pw) compared with strengthening codes.

  8. Fabrication of a microreactor by proton beam writing technique

    Science.gov (United States)

    Huszank, R.; Szilasi, S. Z.; Vad, K.; Rajta, I.

    2009-06-01

    Microreactors are innovative and promising tools in technology nowadays because of their advantages compared to the conventional-scale reactors. These advantages include vast improvements in surface to volume ratio, energy efficiency, reaction speed and yield and increased control of reaction conditions, to name a few examples. The high resolution capability of the micromachining technique utilizing accelerated ion beams in the fabrication technology of microreactors has not yet been taken advantage of. In this work we present the design of a prototype micro-electrochemical cell of 1.5 μL volume (2.5 × 2.5 × 0.240 mm) created with a 3 MeV proton microbeam. The cell can be separated into two half-cells with a suitable membrane applicable to galvanic or fuel cells as well. We deposited gold electrodes on both of the half-cells. The operability of the device was demonstrated by electric current flow between the two electrodes in this micro-electrochemical cell containing a simple electrolyte solution. We used a polycapillary film to separate the two half-cells, hindering the mixing of the anolyte and catholyte solutions. As a result of the minimal mixing caused by the polycapillary film, this cell design can be suitable for electro-synthesis. Due to the high resolution of proton beam writing, it is planned to reduce the dimensions of this kind of microreactor.

  9. SAR IMAGE ENHANCEMENT BASED ON BEAM SHARPENING TECHNIQUE

    Institute of Scientific and Technical Information of China (English)

    LIYong; ZI-IANGKun-hui; ZHUDai-yin; ZHUZhao-da

    2004-01-01

    A major problem encountered in enhancing SAR image is the total loss of phase information and the unknown parameters of imaging system. The beam sharpening technique, combined with synthetic aperture radiation pattern estimation provides an approach to process this kind of data to achieve higher apparent resolution. Based on the criterion of minimizing the expected quadratic estimation error, an optimum FIR filter with a symmetrical structure is designed whose coefficients depend on the azimuth response of local isolated prominent points because this response can be approximately regarded as the synthetic aperture radiation pattern of the imaging system. The point target simulation shows that the angular resolution is improved by a ratio of almost two to one. The processing results of a live SAR image demonstrate the validity of the method.

  10. New diagnostic technique for Zeeman-compensated atomic beam slowing: technique and results

    OpenAIRE

    Molenaar, P.A.; Van Der Straten, P.; Heideman, H.G.M.; Metcalf, H

    2001-01-01

    We have developed a new diagnostic tool for the study of Zeeman-compensated slowing of an alkali atomic beam. Our time-of-flight technique measures the longitudinal veloc- ity distribution of the slowed atoms with a resolution below the Doppler limit of 30 cm/s. Furthermore, it can map the position and velocity distribution of atoms in either ground hyperfine level inside the solenoid without any devices inside the solenoid. The technique reveals the optical pumping ef- fects, and shows in de...

  11. Investigations in CO2 laser beam caustics measuring techniques

    DEFF Research Database (Denmark)

    Olsen, Flemming Ove; Bagger, Claus

    2004-01-01

    The performance of an industrial laser is very much depending upon the characteristics of the laser beam. The ISO standards 11146 and 11154 which are describing test methods for laser beam parameters have been approved.......The performance of an industrial laser is very much depending upon the characteristics of the laser beam. The ISO standards 11146 and 11154 which are describing test methods for laser beam parameters have been approved....

  12. Investigations in CO2 laser beam caustics measuring techniques

    DEFF Research Database (Denmark)

    Olsen, Flemming Ove; Bagger, Claus

    2004-01-01

    The performance of an industrial laser is very much depending upon the characteristics of the laser beam. The ISO standards 11146 and 11154 which are describing test methods for laser beam parameters have been approved.......The performance of an industrial laser is very much depending upon the characteristics of the laser beam. The ISO standards 11146 and 11154 which are describing test methods for laser beam parameters have been approved....

  13. The effect of angle of incidence to low damage sputtering of organic polymers using a C 60 ion beam

    Science.gov (United States)

    Miyayama, Takuya; Sanada, Noriaki; Iida, Shin-ichi; Hammond, John S.; Suzuki, Mineharu

    2008-12-01

    The effect of angle of incidence of C 60 ion beam for low damage polymer depth profiling on TOF-SIMS and XPS has been investigated. In this study, TOF-SIMS and XPS depth profiles were taken at several angles of incidence of C 60 ion beam and the results were compared with each other. By using a higher angle of incidence, in XPS analysis, the changes of atomic concentration for polyethyleneterephthalate (PET) were suppressed. In TOF-SIMS analysis, the degradations of fragment ion intensity for PET and polystyrene (PS) were also suppressed at a higher angle of incidence. Although the information depth of TOF-SIMS is different from that of XPS, both results suggested that a higher angle of incidence is a better condition for low damage polymer depth profiling.

  14. Low temperature growth of Co{sub 2}MnSi films on diamond semiconductors by ion-beam assisted sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Nishiwaki, M.; Ueda, K., E-mail: k-ueda@numse.nagoya-u.ac.jp; Asano, H. [Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)

    2015-05-07

    High quality Schottky junctions using Co{sub 2}MnSi/diamond heterostructures were fabricated. Low temperature growth at ∼300–400 °C by using ion-beam assisted sputtering (IBAS) was necessary to obtain abrupt Co{sub 2}MnSi/diamond interfaces. Only the Co{sub 2}MnSi films formed at ∼300–400 °C showed both saturation magnetization comparable to the bulk values and large negative anisotropic magnetoresistance, which suggests half-metallic nature of the Co{sub 2}MnSi films, of ∼0.3% at 10 K. Schottky junctions formed using the Co{sub 2}MnSi films showed clear rectification properties with rectification ratio of more than 10{sup 7} with Schottky barrier heights of ∼0.8 eV and ideality factors (n) of ∼1.2. These results indicate that Co{sub 2}MnSi films formed at ∼300–400 °C by IBAS are a promising spin source for spin injection into diamond semiconductors.

  15. Effect of oxygen partial pressure on the structural and optical properties of ion beam sputtered TiO2 thin films

    Science.gov (United States)

    Tantray, Firdous A.; Chouhan, Romita; Rajput, Swati; Agrawal, Arpana; Andrews, Joseph T.; Sen, Pranay K.; Gupta, Mukul; Sen, Pratima

    2016-10-01

    We report the effect of oxygen partial pressure on the structural, electronic and nonlinear optical properties of ion beam sputtered TiO2 thin films deposited on glass substrate at 40% of oxygen (S1) and 20% of oxygen (S2) partial pressure. XRD data shows the crystalline nature of S1 film while the film S2 was amorphous in nature. The energy band gap of the thin films calculated from their UV-Vis spectra was found to be 3.63 eV (S1) and 3.56 eV (S2). The decrease in the band gap with decrease in oxygen partial pressure may be attributed to the amorphous nature of the film. The nonlinear refractive indices for both the films were obtained from the closed aperture Z-scan experiment performed using a cw He-Ne laser source operating at 632.8 nm and were found to be 17.6×10-9 m2/W and -5.64×10-9 m2/W for S1and S2 films, respectively. The reversal in the sign of the nonlinear refractive index may also be ascribed to the crystallinity of the grown films.

  16. ITO films realized at room-temperature by ion beam sputtering for high-performance flexible organic light-emitting diodes

    Energy Technology Data Exchange (ETDEWEB)

    Lucas, B.; Rammal, W.; Moliton, A. [Limoges Univ., Faculte des Sciences et Techniques, CNRS, UMR 6172, Institut de Recherche XLIM, Dept. MINACOM, 87 - Limoges (France)

    2006-06-15

    Indium-tin oxide (ITO) thin layers are obtained by an IBS (Ion Beam Sputtering) deposition process. We elaborated ITO films on flexible substrates of polyethylene terephthalate (PET), under soft conditions of low temperatures and fulfilling the requirements of fabrication processes of the organic optoelectronic components. With a non thermally activated (20 Celsius degrees) ITO deposition assisted by an oxygen flow (1 cm{sup 3}/min), we got an optical transmittance of 90% in the visible range, a resistivity around 10{sup -3} {omega}.cm and a surface roughness lower than 1.5 mm. Thus we realized flexible organic light-emitting diodes (FOLEDs) with good performances: a maximum luminance of 12000 cd/m{sup 2} at a voltage of 19 V and a maximum luminous power efficiency around 1 lm/W at a voltage of 10 V (or a maximum current efficiency of 4 cd/A at 14 V) for the (PET(50 {mu}m) / ITO(200 nm) / TPD(40 nm) / Alq3(60 nm) / Ca / Al) structure. (authors)

  17. Ion beam sputter deposition of low-defect EUV mask blanks on 6-in. LTEM substrates in a real production environment

    Science.gov (United States)

    Becker, Hans W.; Aschke, Lutz; Schubert, Birgit; Krieger, Juergen; Lenzen, Frank; Yulin, Sergey A.; Feigl, Torsten; Kuhlmann, Thomas; Kaiser, Norbert

    2002-07-01

    EUV mask blanks consist of two thin film systems deposited on low thermal expansion 6 inch substrates (LTEM). First there is the multilayer stack with around 100 alternating layers of elements with different optical properties which are topped by a capping layer. Beside optimal optical properties it is also necessary to improve the heat stability of the layer system. The absorber stack which consists of a buffer and an absorber layer is next. Here a minimum absorption of EUV light of 99 percent is required. The stress in both layer systems should be as low as possible. The reduction of defects to an absolute minimum is one of the main challenges. The high-reflective Mo/Si multilayer coatings were designed for normal incidence reflectivity and successfully deposited on 6-inch LTEM substrates by ion-beam sputtering. X-ray scattering, transmission electron microscopy and atomic force microscopy were used for characterization of the multilayer interfaces and the surface morphology. The results are correlated to the measured normal incidence reflectivity using synchrotron radiation at the PTB reflectometer at BESSY II, Berlin, Germany.

  18. Ion beam analysis, corrosion resistance and nanomechanical properties of TiAlCN/CN{sub x} multilayer grown by reactive magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Alemón, B.; Flores, M. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jal. 45101 (Mexico); Canto, C. [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, Mexico, DF 04510 (Mexico); Andrade, E., E-mail: andrade@fisica.unam.mx [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, Mexico, DF 04510 (Mexico); Lucio, O.G. de [Instituto de Física, UNAM, Avenida de la Investigación S/N, Coyoacán, Mexico, DF 04510 (Mexico); Rocha, M.F. [ESIME-Z, Instituto Politécnico Nacional, ALM Zacatenco, Mexico, DF 07738 (Mexico); Broitman, E. [Thin Films Physics Division, IFM, Linköping University, SE-58183 Linköping (Sweden)

    2014-07-15

    A novel TiAlCN/CN{sub x} multilayer coating, consisting of nine TiAlCN/CN{sub x} periods with a top layer 0.5 μm of CN{sub x}, was designed to enhance the corrosion resistance of CoCrMo biomedical alloy. The multilayers were deposited by dc and RF reactive magnetron sputtering from Ti{sub 0.5}Al{sub 0.5} and C targets respectively in a N{sub 2}/Ar plasma. The corrosion resistance and mechanical properties of the multilayer coatings were analyzed and compared to CoCrMo bulk alloy. Ion beam analysis (IBA) and X-ray diffraction tests were used to measure the element composition profiles and crystalline structure of the films. Corrosion resistance was evaluated by means of potentiodynamic polarization measurements using simulated body fluid (SBF) at typical body temperature and the nanomechanical properties of the multilayer evaluated by nanoindentation tests were analyzed and compared to CoCrMo bulk alloy. It was found that the multilayer hardness and the elastic recovery are higher than the substrate of CoCrMo. Furthermore the coated substrate shows a better general corrosion resistance than that of the CoCrMo alloy alone with no observation of pitting corrosion.

  19. Impact tests of the tungsten coated stainless steels prepared by using magnetron sputtering with ion beam mixing or electron beam alloying treatment

    Science.gov (United States)

    Zou, Yu; Zhan, Chang-Yong; Yang, Bin; Wu, Jian-Chun

    2013-05-01

    Tungsten films were deposited on stainless steel (SS) with ion beam mixing (IBM) or electron beam alloying (EBA) treatment. The ductile-brittle transition behaviors of the specimens were investigated by means of instrumented Charpy impact test at a series of temperature, and SEM was used to observe the morphology of the cross section. Impact tests show that different treatment methods with W films do not have much influence on crack initiation, while EBA treatment with W films can more effectively prevent crack propagation, namely improve the impact toughness of SS than using IBM treatment. The reason that caused this difference was discussed.

  20. The Technique of Genetic Transformation Mediated by keV Ion Beam

    Institute of Scientific and Technical Information of China (English)

    卞坡; 余增亮

    2005-01-01

    The application of keV ion beam in life science started in China several decades ago. In 1986, researchers initially studied the mutagenic effect of ion beam, and successfully applied it to plant breeding. Nowadays, ion beam implantation technique has been extensively applied to many biological fields. This paper mainly introduces one of its important applications: genetic transformation mediated by keV ion beam.

  1. An adaptive laser beam shaping technique based on a genetic algorithm

    Institute of Scientific and Technical Information of China (English)

    Ping Yang; Yuan Liu; Wei Yang; Minwu Ao; Shijie Hu; Bing Xu; Wenhan Jiang

    2007-01-01

    @@ A new adaptive beam intensity shaping technique based on the combination of a 19-element piezo-electricity deformable mirror (DM) and a global genetic algorithm is presented. This technique can adaptively adjust the voltages of the 19 actuators on the DM to reduce the difference between the target beam shape and the actual beam shape. Numerical simulations and experimental results show that within the stroke range of the DM, this technique can be well used to create the given beam intensity profiles on the focal plane.

  2. An Efficient Beam Training Technique for mmWave Communication Under NLoS Channel Conditions

    OpenAIRE

    Yuan, Wenfang; Armour, Simon; Doufexi, Angela

    2016-01-01

    An efficient codebook-based beam training technique is proposed for mmWave communication systems operating under non-line-of-sight (NLoS) channel conditions. Using convex optimization theory, this technique formulates the beam training process as a combinational optimization problem. It finds the best transmit-receive beam pair that maximizes the received signal power by iterating the Nelder-Mead simplex method through a multi-stage formulation of the training process. Compared with beamformi...

  3. Micro-beam and pulsed laser beam techniques for the micro-fabrication of diamond surface and bulk structures

    Energy Technology Data Exchange (ETDEWEB)

    Sciortino, S. [Dipartimento di Fisica e Astronomia, Università di Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, Firenze (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, Firenze (Italy); Bellini, M. [European Laboratory for Non-Linear Spectroscopy, Via Nello Carrara 1, 50019 Sesto Fiorentino (Italy); Istituto Nazionale di Ottica (INO-CNR), Largo Enrico Fermi 6, 50125 Firenze (Italy); Bosia, F. [Physics Department and “Nanostructured Interfaces and Surfaces” Inter-departmental Centre, University of Torino, via P. Giuria 1, 10125 Torino (Italy); INFN Sezione di Torino, via P. Giuria 1, 10125 Torino (Italy); Calusi, S. [Dipartimento di Fisica e Astronomia, Università di Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, Firenze (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, Firenze (Italy); Corsi, C. [Dipartimento di Fisica e Astronomia, Università di Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, Firenze (Italy); European Laboratory for Non-Linear Spectroscopy, Via Nello Carrara 1, 50019 Sesto Fiorentino (Italy); Czelusniak, C. [Dipartimento di Fisica e Astronomia, Università di Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, Firenze (Italy); Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, Firenze (Italy); Gelli, N. [Istituto Nazionale di Fisica Nucleare (INFN), Sezione di Firenze, Via Sansone 1, I-50019 Sesto Fiorentino, Firenze (Italy); and others

    2015-04-01

    Micro-fabrication in diamond is applicable in a wide set of emerging technologies, exploiting the exceptional characteristics of diamond for application in bio-physics, photonics and radiation detection. Micro ion-beam irradiation and pulsed laser irradiation are complementary techniques, which permit the implementation of complex geometries, by modification and functionalization of surface and/or bulk material, modifying the optical, electrical and mechanical characteristics of the material. In this article we summarize the work done in Florence (Italy), concerning ion beam and pulsed laser beam micro-fabrication in diamond.

  4. A feasibility study of H{sup -} beam extraction technique using YAG laser

    Energy Technology Data Exchange (ETDEWEB)

    Meigo, Shin-ichiro; Hasegawa, Kazuo; Ikeda, Yujiro; Oigawa, Hiroyuki [Japan Atomic Energy Research Inst., Tokai, Ibaraki (Japan). Tokai Research Establishment; Aoki, Nobutada [Toshiba Power System Co., Ltd. (Japan); Nakagawa, Satoshi [Toshiba Co., Tokyo (Japan)

    2002-12-01

    Under a framework of JAERI-KEK joint project of high intensity proton accelerator, as for research and develop of the accelerator driven nuclear transmutation of the long lived radioactive nuclide, it is planed to built the Transmutation Physics Experiment Facility (TEF-P) and the Transmutation Engineering Experiment Facility (TEF-E). The TEF-P is used for the experiments for subcritical system coupled with a spallation neutron target bombarded with 600-MeV proton beam accelerated by the LINAC. To limit the maximum thermal power less than 500 W at the TEF-P, an incident beam power should be less than 10 W. On the contrary, at the TEF-E, high power beam of 200 kW is requested. Both high and low power beams are demanded for the transmutation facilities. It is difficult to deliver a low power beam to the TEF-P. Conventional beam extraction technique with a thin foil, is not desirable because the scattering of the beam at the foil requires the massive shield. Therefore, we study a new technique to extract a small portion of the beam precisely from the high intensity beam by using a laser beam. By a laser beam, H{sup -} in the beam from LINAC is partially changed to H{sup 0} beam so that a low current H{sup 0} beam can be obtained. As the cross section of the charge exchange reaction for H{sup -} ions has a peak around at a wave length of 1 {mu}m for photons, YAG laser is suitable for this charge exchange because of its 1.06 {mu}m wave length. It is derived that 10 W beam for 600-MeV proton can be extracted by the YAG laser with power of 2 J for each pulse of 25 Hz. By this technique, the pulse width for the extracted beam can be controlled by changing the time width of laser irradiation. When a charge exchanger having the beam collide point existing in straight section, a background beam current of projectile, however, will be increased due to the interaction with the residual gas in the beam duct. Thus, a charge exchanger is devised having the beam collide point in a

  5. PREFACE 12th International Workshop on Slow Positron Beam Techniques

    Science.gov (United States)

    Buckman, Stephen; Sullivan, James; White, Ronald

    2011-01-01

    Preface These proceedings arose from the 12th International Workshop on Slow Positron Beam Techniques (SLOPOS12), which was held on Magnetic Island, North Queensland, Australia, between 1-6th August 2010. Meetings in the SLOPOS series are held (roughly) every three years and have now been held on (almost) all continents, indicating the truly international nature of the field. SLOPOS12 marked the second time that the Workshop had been held in the southern hemisphere, and the first time in Australia. SLOPOS12 attracted 122 delegates from 16 countries. Most encouraging was the attendance of 28 student delegates, and that about half of the overall delegates were early career researchers - a good sign for the future of our field. We also enjoyed the company of more than a dozen partners and families of delegates. In a slight departure from previous SLOPOS meetings, the International Advisory Committee approved a broader scope of scientific topics for inclusion in the program for the 2010 Workshop. This broader scope was intended to capture the applications of positrons in atomic, molecular and biomedical areas and was encapsulated in the byeline for SLOPOS-12: The 12th International Workshop on Slow Positron Beam Techniques for Solids, Surfaces, Atoms and Molecules. The scientific and social program for the meeting ran over 6 days with delegates gathering on Sunday August 1st and departing on August 6th. The scientific program included plenary, invited, contributed and student lectures, the latter being the subject of a student prize. In all there were 53 oral presentations during the week. There were also two poster sessions, with 63 posters exhibited, and a prize was awarded for the best poster by a student delegate. The standard of the student presentations, both oral and posters, was outstanding, so much so that the judging panel recommended an additional number of prizes be awarded. Topics that were the focus of invited presentations and contributed papers at

  6. Magnetic annealing of the ion-beam sputtered IrMn/CoFeB bilayers - positive exchange bias and coercivity behaviour

    Science.gov (United States)

    Raju, M.; Chaudhary, Sujeet; Pandya, D. K.

    2013-12-01

    The effect of optimum dilution of antiferromagnetic (AF)/ferromagnetic (FM) interface necessary for observance of positive exchange bias in ion-beam sputtered Si/Ir22Mn78 ( t AF = 12, 18, 24 nm)/Co20Fe60B20( t FM = 6,9,15 nm) exchange coupled bilayers is investigated by magnetic annealing at 380, 420 and 460 °C for 1 h at 5 × 10-6 Torr in presence of 500 Oe magnetic field. While the coercivity of the exchange coupled FM layer decreases with the increase in annealing temperature irrespective of the value of t AF or t FM, the hysteresis loops however shift by ≈+ 10 Oe whenever the coercivity drops in the 10-15 Oe range. This is consistent with the phase diagram of exchange bias field and coercivity derived from Meiklejohn and Bean model. The X-ray diffraction and X-ray reflectivity measurements confirmed that the texture, grain size and interface roughness of IrMn/CoFeB bilayers are thickness dependent and are correlated to the observed magnetic response of the bilayers. The results establish that optimum dilution of the IrMn/CoFeB interface by thermally diffused Mn-spins is necessary in inducing the effective coupling between the IrMn domains and diluted CoFeB layer. It is further shown that the annealing temperature required for the optimum dilution of the CoFeB interface critically depends on the thickness of the layers.

  7. Optical and structural characterization of titanium dioxide films growth by the r f-sputtering technique; Caracterizacion optica y estructural de peliculas de dioxido de titanio crecidas por la tecnica de rf-sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Florido C, A.; Calderon, A. [CICATA-IPN, Av. Legaria 694, 11500 Mexico D.F. (Mexico); Mendoza A, J.G.; Becerril, M.; Zelaya A, O. [CINVESTAV, A.P. 14-740, 07000 Mexico D.F. (Mexico)

    2007-07-01

    Full text: The elaboration of a series of grown films of TiO on Corning glaze substrates, as well as silicon, by means of the rf-sputtering technique using one power of 160 watts, with the objective of obtaining the anatase phase which one presents better activity for applications in photo catalysis. In the process of growth it was used a temperature in the range from 300 to 600 C and a separation distance among the target and the substrate of 3.5 cm. The used atmosphere was a mixture of argon and oxygen. It was carried out the characterization of the films obtained by means of UV-vis spectrophotometry, and photoluminescence (FL). The microstructure analysis was carried out by means of X-ray diffraction (XRD), micro-Raman (MR), and atomic force microscopy (AFM). By means of the diffractographs it was determined the grain size. Our results show that in our films they are present the anatase and rutile phases of the titanium dioxide. The analysis of the results of optical spectra shows a forbidden band of the titanium dioxide around 3.2 eV. (Author)

  8. ECR Sputter Feed Development at NSCL%NSCL溅射金属离子产生研究进展

    Institute of Scientific and Technical Information of China (English)

    D.Cole; G.Machicoane; L.Tobos; P.Zavodszky

    2007-01-01

    Production of metallic ion beams in support of the experimental program at the Coupled Cyclotron Facility at the NSCL required the development of ion sputtering feed of metallic molybdenum,nickel,uranium,and zirconium for use with the ARTEMIS ion source.The production of high intensity lower to medium charge state ions required high material consumption,posing sonle significant difficulties in reliable long term beam stability.Resultant and ongoing hardware and technique developments to resolve these difficulties will be presented in this poster along with interesting effects of the ion source solenoid field polarity on the sputtering process.

  9. Carbon-nanotube electron-beam (C-beam) crystallization technique for silicon TFTs

    Science.gov (United States)

    Lee, Su Woong; Kang, Jung Su; Park, Kyu Chang

    2016-02-01

    We introduced a carbon-nanotube (CNT) electron beam (C-beam) for thin film crystallization and thin film transistor (TFT) applications. As a source of electron emission, a CNT emitter which had been grown on a silicon wafer with a resist-assisted patterning (RAP) process was used. By using the C-beam exposure, we successfully crystallized a silicon thin film that had nano-sized crystalline grains. The distribution of crystalline grain size was about 10 ˜ 30 nm. This nanocrystalline silicon thin film definitely had three crystalline directions which are (111), (220) and (311), respectively. The silicon TFTs crystallized by using a C-beam exposure showed a field effect mobility of 20 cm2/Vs and an on/off ratio of more than 107. The C-beam exposure can modify the bonding network of amorphous silicon with its proper energy.

  10. Development of plant mutation techniques using ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Kang, Si Yong; Park, In Sook; Song, Hi Sup; Kim, Dong Sub; Kim, Soo Yeon

    2006-06-15

    It has been reported that ion beam with high liner energy transfer (LET) show relative high biological effectiveness (RBE) and more effective for induced plant mutation than low LET radiation i.e., X-rays, gamma rays and electrons. This study was conducted to induce mutation of in vitro cultured orchid and Chrysanthemum using proton beam of the MC-50 cyclotron (50 MeV) at the Korea Institute of Radiological and Medical Science. In vitro cultured stems of chrysanthemum(cv. Migok) and protocom-like bodies(PLBs) of Dendrobium orchid (cv. Kingianum) placed in the plastic petridish (5.5cm in diameter) with agar medium were irradiated by the proton beam with various dose ranges of 10, 25, 50, 100 Gy under the condition of 5nA beam current. Those irradiated plants were transferred to subculture media and then investigated growth characteristics. Shoot growth of chrysanthemum and orchid was decreased by increase of irradiation dose. In particular, new shoot formation was hardly founded over 50Gy in chrysanthemum and 100 Gy in orchid. Some leaf mutants were observed at the 25 Gy and 50 Gy irradiated PLBs of the orchid. The dry seeds of hot pepper, rapeseed, rice and perilla also were irradiated with proton beam of MC-50 cyclotron and then measured germination rate and early growth of M1 plants compared with gamma ray irradiation.

  11. Transparent conductive Hf-doped In2O3 thin films by RF sputtering technique at low temperature annealing

    Science.gov (United States)

    Wang, G. H.; Shi, C. Y.; Zhao, L.; Diao, H. W.; Wang, W. J.

    2017-03-01

    Hf-doped In2O3 transparent conductive polycrystalline films (IHFO) were grown at a low substrate temperature by radio frequency magnetron sputtering for the applications of silicon-based solar cell. The effect of argon flow rate on the electrical and optical properties of the films was investigated. Low temperature thermal treatment improved IHFO films properties, with the optimal Hall mobility of 79.6 cm2/Vs and resistivity of 3.76 × 10-4 Ω cm. The average transmittance of the 807 nm thick IHFO films in the range of 300-1500 nm was above 83%. The carrier density was utilized to evaluate the plasma wavelength of IHFO conducting film which was 1.8 μm. The optimized IHFO film was then applied to amorphous silicon germanium thin film solar cells as the contacting layer. Compared to the cell without such a layer, the efficiency was higher by 0.35%.

  12. Beaconless adaptive-optics technique for HEL beam control

    Science.gov (United States)

    Khizhnyak, Anatoliy; Markov, Vladimir

    2016-05-01

    Effective performance of forthcoming laser systems capable of power delivery on a distant target requires an adaptive optics system to correct atmospheric perturbations on the laser beam. The turbulence-induced effects are responsible for beam wobbling, wandering, and intensity scintillation, resulting in degradation of the beam quality and power density on the target. Adaptive optics methods are used to compensate for these negative effects. In its turn, operation of the AOS system requires a reference wave that can be generated by the beacon on the target. This report discusses a beaconless approach for wavefront correction with its performance based on the detection of the target-scattered light. Postprocessing of the beacon-generated light field enables retrieval and detailed characterization of the turbulence-perturbed wavefront -data that is essential to control the adaptive optics module of a high-power laser system.

  13. A Novel Microwave Beam Steering Technique Using Plasma

    Science.gov (United States)

    Linardakis, Peter; Borg, Gerard G.; Harris, Jeffrey H.; Martin, Noel M.

    2002-10-01

    At frequencies above the plasma frequency, electromagnetic waves propagate through plasma with a wavelength longer than the free space wavelength. As a result, a plasma with a centrally peaked density profile can deflect rather than focus electromagnetic waves. We present a plasma device designed specifically to deflect a microwave beam as an alternative to conventional beam deflectors based on antenna arrays. A 22^rc deflection of Ka band microwave has been achieved using a laboratory plasma, with no detrimental effect on the beamwidth or side-lode level and structure. The use of a simple WKB model shows agreement and that the deflection can be increased with appropriate design. Results indicate the potential for increases in dynamic range, in power handling (for example from a gyrotron) and for the reduction of insertion losses over current beam steering systems. A ``plasma lens'' demonstrator device has also been designed to test practical performance aspects such as phase noise and to test optimization parameters.

  14. Carbon thin films deposited by the magnetron sputtering technique using cobalt, copper and nickel as buffer-layers; Filmes finos de carbono depositados por meio da tecnica de magnetron sputtering usando cobalto, cobre e niquel como buffer-layers

    Energy Technology Data Exchange (ETDEWEB)

    Costa e Silva, Danilo Lopes

    2015-11-01

    In this work, carbon thin films were produced by the magnetron sputtering technique using single crystal substrates of alumina c-plane (0001) and Si (111) and Si (100) substrates, employing Co, Ni and Cu as intermediate films (buffer-layers). The depositions were conducted in three stages, first with cobalt buffer-layers where only after the production of a large number of samples, the depositions using cooper buffer-layers were carried out on Si substrates. Then, depositions were performed with nickel buffer layers using single-crystal alumina substrates. The crystallinity of the carbon films was evaluated by using the technique of Raman spectroscopy and, then, by X-ray diffraction (XRD). The morphological characterization of the films was performed by scanning electron microscopy (SEM and FEG-SEM) and high-resolution transmission electron microscopy (HRTEM). The XRD peaks related to the carbon films were observed only in the results of the samples with cobalt and nickel buffer-layers. The Raman spectroscopy showed that the carbon films with the best degree of crystallinity were the ones produced with Si (111) substrates, for the Cu buffers, and sapphire substrates for the Ni and Co buffers, where the latter resulted in a sample with the best crystallinity of all the ones produced in this work. It was observed that the cobalt has low recovering over the alumina substrates when compared to the nickel. Sorption tests of Ce ions by the carbon films were conducted in two samples and it was observed that the sorption did not occur probably because of the low crystallinity of the carbon films in both samples. (author)

  15. Damage identification in beams by a response surface based technique

    Directory of Open Access Journals (Sweden)

    Teidj S.

    2014-01-01

    Full Text Available In this work, identification of damage in uniform homogeneous metallic beams was considered through the propagation of non dispersive elastic torsional waves. The proposed damage detection procedure consisted of the following sequence. Giving a localized torque excitation, having the form of a short half-sine pulse, the first step was calculating the transient solution of the resulting torsional wave. This torque could be generated in practice by means of asymmetric laser irradiation of the beam surface. Then, a localized defect assumed to be characterized by an abrupt reduction of beam section area with a given height and extent was placed at a known location of the beam. Next, the response in terms of transverse section rotation rate was obtained for a point situated afterwards the defect, where the sensor was positioned. This last could utilize in practice the concept of laser vibrometry. A parametric study has been conducted after that by using a full factorial design of experiments table and numerical simulations based on a finite difference characteristic scheme. This has enabled the derivation of a response surface model that was shown to represent adequately the response of the system in terms of the following factors: defect extent and severity. The final step was performing the inverse problem solution in order to identify the defect characteristics by using measurement.

  16. Techniques to produce and accelerate radioactive ion beams

    CERN Document Server

    Penescu, Liviu Constantin; Lettry, Jacques; Cata-Danil, Gheorghe

    The production and acceleration of the Radioactive Ion Beams (RIB) continues the long line of nuclear investigations started in the XIXth century by Pierre and Marie Curie, Henri Becquerel and Ernest Rutherford. The contemporary applications of the RIBs span a wide range of physics fields: nuclear and atomic physics, solid-state physics, life sciences and material science. ISOLDE is a world-leading Isotope mass-Separation On-Line (ISOL) facility hosted at CERN in Geneva for more than 40 years, offering the largest variety of radioactive ion beams with, until now, more than 1000 isotopes of more than 72 elements (with Z ranging from 2 to 88), with half-lives down to milliseconds and intensities up to 1011 ions/s. The post acceleration of the full variety of beams allows reaching final energies between 0.8 and 3.0 MeV/u. This thesis describes the development of a new series of FEBIAD (“Forced Electron Beam Induced Arc Discharge”) ion sources at CERN-ISOLDE. The VADIS (“Versatile Arc Discharge Ion Source�...

  17. Beam manipulation techniques, nonlinear beam dynamics, and space charge effect in high energy high power accelerators

    Energy Technology Data Exchange (ETDEWEB)

    Lee, S. Y.

    2014-04-07

    We had carried out a design of an ultimate storage ring with beam emittance less than 10 picometer for the feasibility of coherent light source at X-ray wavelength. The accelerator has an inherent small dynamic aperture. We study method to improve the dynamic aperture and collective instability for an ultimate storage ring. Beam measurement and accelerator modeling are an integral part of accelerator physics. We develop the independent component analysis (ICA) and the orbit response matrix method for improving accelerator reliability and performance. In collaboration with scientists in National Laboratories, we also carry out experimental and theoretical studies on beam dynamics. Our proposed research topics are relevant to nuclear and particle physics using high brightness particle and photon beams.

  18. Optical and local structural study of Gd doped ZrO{sub 2} thin films deposited by RF magnetron sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Haque, S. Maidul, E-mail: skmaidulhaque@gmail.com; Shinde, D. D.; Misal, J. S. [Atomic & Molecular Physics Division, Bhabha Atomic Research Centre, VIZAG Centre, Visakhapatnam-530012 (India); Jha, S. N.; Bhattacharyya, D.; Sahoo, N. K. [Atomic & Molecular Physics Division, Bhabha Atomic Research Centre. Mumbai – 400094 (India)

    2015-06-24

    ZrO{sub 2} samples with 0, 7, 9, 11, 13 % Gd doping have been prepared by RF magnetron sputtering deposition technique for solid oxide fuel cell application. The optical properties of the samples have been studied by transmission spectrophotometry and spectroscopic ellipsometry while the local structure surrounding Zr sites has been characterized by extended x-ray absorption fine structure (EXAFS) measurement at Zr K edge with synchrotron radiation. It has been observed that beyond 11% Gd doping, band gap decreases and refractive index increases significantly and also oxygen and Zr coordinations surrounding Zr sites increase which indicates the formation of Gd clustering in ZrO{sub 2} matrix beyond this doping concentration.

  19. Adaptation of ion beam technology to microfabrication of solid state devices and transducers

    Science.gov (United States)

    Topich, J. A.

    1977-01-01

    It was found that ion beam texturing of silicon surfaces can be used to increase the effective surface area of MOS capacitors. There is, however, a problem with low dielectric breakdown. Preliminary work was begun on the fabrication of ion implanted resistors on textured surfaces and the potential improvement of wire bond strength by bonding to a textured surface. In the area of ion beam sputtering, the techniques for sputtering PVC were developed. A PVC target containing valinomycin was used to sputter an ion selective membrane on a field effect transistor to form a potassium ion sensor.

  20. SU-E-T-75: A Simple Technique for Proton Beam Range Verification

    Energy Technology Data Exchange (ETDEWEB)

    Burgdorf, B; Kassaee, A; Garver, E [University of Pennsylvania, Philadelphia, PA (United States)

    2015-06-15

    Purpose: To develop a measurement-based technique to verify the range of proton beams for quality assurance (QA). Methods: We developed a simple technique to verify the proton beam range with in-house fabricated devices. Two separate devices were fabricated; a clear acrylic rectangular cuboid and a solid polyvinyl chloride (PVC) step wedge. For efficiency in our clinic, we used the rectangular cuboid for double scattering (DS) beams and the step wedge for pencil beam scanning (PBS) beams. These devices were added to our QA phantom to measure dose points along the distal fall-off region (between 80% and 20%) in addition to dose at mid-SOBP (spread out Bragg peak) using a two-dimensional parallel plate chamber array (MatriXX™, IBA Dosimetry, Schwarzenbruck, Germany). This method relies on the fact that the slope of the distal fall-off is linear and does not vary with small changes in energy. Using a multi-layer ionization chamber (Zebra™, IBA Dosimetry), percent depth dose (PDD) curves were measured for our standard daily QA beams. The range (energy) for each beam was then varied (i.e. ±2mm and ±5mm) and additional PDD curves were measured. The distal fall-off of all PDD curves was fit to a linear equation. The distal fall-off measured dose for a particular beam was used in our linear equation to determine the beam range. Results: The linear fit of the fall-off region for the PDD curves, when varying the range by a few millimeters for a specific QA beam, yielded identical slopes. The calculated range based on measured point dose(s) in the fall-off region using the slope resulted in agreement of ±1mm of the expected beam range. Conclusion: We developed a simple technique for accurately verifying the beam range for proton therapy QA programs.

  1. Fabrication of amorphous Zr{sub 48}Cu{sub 36}Al{sub 8}Ag{sub 8} thin films by ion beam sputtering and their corrosion behavior in SBF for bio implants

    Energy Technology Data Exchange (ETDEWEB)

    Subramanian, B., E-mail: bsmanian@ceceri.res.in [CSIR – Central Electrochemical Research Institute, Karaikudi 630 006 (India); Yugeswaran, S.; Kobayashi, Akira [Joining and Welding Research Institute, Osaka University, Osaka 567-0047 (Japan); Jayachandran, M. [CSIR – Central Electrochemical Research Institute, Karaikudi 630 006 (India)

    2013-09-25

    Highlights: •The deposited alloys were shown to have amorphous structure. •Coated specimen had higher corrosion resistance in SBF. •Coatings were non-cytotoxic in nature. -- Abstract: The growth of multi component amorphous Zr{sub 48}Cu{sub 36}Al{sub 8}Ag{sub 8} thin film metallic glasses (TFMGs) using single target ion beam sputtering has been systematically investigated. The as prepared sputtering target was crystalline in nature. The presence of the constituent elements was identified from EPMA and AES analysis. An atomically disordered structure was observed by micro X-ray diffraction, electron diffraction and high resolution transmission electron microscopy. Glassy films with atomically smooth surfaces of the order of 0.4 nm with higher nanohardness of 9.33 GPa and Young’s modulus of 117 GPa compared to their crystalline substrate was observed from nanoindentation analysis. The study of in vitro corrosion of these coatings on implantable 316L stainless steel substrate in simulated body fluid (SBF) indicated that the as sputtered specimen had higher corrosion resistance without any localized pitting.

  2. Ion-beam technologies

    Energy Technology Data Exchange (ETDEWEB)

    Fenske, G.R. [Argonne National Lab., IL (United States)

    1993-01-01

    This compilation of figures and diagrams reviews processes for depositing diamond/diamond-like carbon films. Processes addressed are chemical vapor deposition (HFCVD, PACVD, etc.), plasma vapor deposition (plasma sputtering, ion beam sputtering, evaporation, etc.), low-energy ion implantation, and hybrid processes (biased sputtering, IBAD, biased HFCVD, etc.). The tribological performance of coatings produced by different means is discussed.

  3. ELECTRICAL PROPERTIES OF Cr/CrN NANO-MULTILAYERS PRODUCED BY THE UNBALANCED MAGNETRON SPUTTERING TECHNIQUE

    Directory of Open Access Journals (Sweden)

    DIANA MARITZA MARULANDA CARDONA

    2011-01-01

    Full Text Available Peliculas de nitruro de cromo (CrN se han aplicado como recubrimientos protectores contra el desgaste y la corrosion debido a sus excelentes propiedades mecanicas y alta resistencia a la corrosion, y en el campo electronico debido a su baja resistividad. Sin embargo, se ha encontrado que las multicapas que combinan peliculas metal/ceramico podrian mejorar las propiedades en comparacion a sus contrapartes en monocapa debido al aumento e interaccion entre interfaces. En este trabajo se produjeron nano-multicapas de Cr/CrN a traves de la tecnica de sputtering con magnetron desbalanceado con tres grados de desbalanceo diferentes para estudiar la influencia de este parametro en las propiedades electricas. Se crecieron multicapas con un espesor total de aproximadamente 1 microm y un periodo de bicapa (A de 200 nm, 100 nm y 20 nm. Las multicapas se produjeron a temperatura ambiente sobre acero H13 y silicio (100 y se estudio su microestructura y las propiedades electricas en funcion del campo magnetico. La formacion de fases se caracterizo a traves de Difraccion de Rayos X y los resultados muestran las orientaciones (111 y (200 para todas las multicapas. Se obtuvieron imagenes de la seccion transversal a traves de Microscopia Electronica de Barrido y los resultados muestran la formacion de una estructura en multicapas.

  4. Effects of discharge power on the structural and optical properties of TGZO thin films prepared by RF magnetron sputtering technique

    Science.gov (United States)

    Gu, Jin-hua; Lu, Zhou; Zhong, Zhi-you; Long, Lu; Long, Hao

    2016-05-01

    The transparent semiconductors of Ti and Ga-incorporated ZnO (TGZO) thin films were prepared by radio frequency (RF) magnetron sputtering onto glass substrates. The effects of discharge power on the physical properties of thin films are studied. Experimental results show that all nanocrystalline TGZO thin films possess preferential orientation along the (002) plane. The discharge power significantly affects the crystal structure and optical properties of thin films. When the discharge power is 200 W, the TGZO thin film has the optimal crystalline quality and optical properties, with the narrowest full width at half-maximum ( FWHM) of 1.76×10-3 rad, the largest average grain size of 82.4 nm and the highest average transmittance of 84.3% in the visible range. The optical gaps of thin films are estimated by the Tauc's relation and observed to increase firstly and then decrease with the increase of the discharge power. In addition, the optical parameters, including refractive index, extinction coefficient, dielectric function and dissipation factor of the thin films, are determined by optical characterization methods. The dispersion behavior of the refractive index is also analyzed using the Sellmeier's dispersion model.

  5. A technique to sharpen the beam penumbra for Gamma Knife radiosurgery

    Energy Technology Data Exchange (ETDEWEB)

    Guerrero, M; Li, X Allen; Ma Lijun [Department of Radiation Oncology, University of Maryland, School of Medicine, Baltimore, MD 21201 (United States)

    2003-06-21

    In stereotactic radiosurgery, a narrow beam penumbra is often desired for producing steep dose fall-off between the target volume and adjacent critical structures. Due to limited source sizes and the scattering effects, the physical penumbra of the Gamma Knife (GK) is often restricted to a width of 1-2 mm. In this work, we developed a technique to further reduce the beam penumbra and improve the dose profile for the Gamma Knife delivery. Under this technique, a conic filter is inserted into an individual plug collimator of a GK helmet to flatten the beam profile. Monte Carlo calculations were carried out to simulate the GK geometry of the individual plug collimator and to optimize the physical shapes of the filters. The calculations were performed for a series of filter shapes with different collimator sizes. Our results show that a proper filter significantly reduces the single GK beam penumbra width (defined as the distance from the 90% to 50% isodose lines) by 30-60%. The beam intensity is reduced by about 20-50% when the filter is used. A treatment plan was developed for a trigeminal neuralgia case by commissioning the filtered beam profile for Leksell Gamma Plan (version 5.31). Compared with the conventional treatment plan, a significant improvement was found on the critical structure sparing and on the target dose uniformity. In conclusion, the proposed technique is feasible and effective in sharpening the beam penumbra for Gamma Knife beam profiles.

  6. An evaluation testing technique of single event effect using Beam Blanking SEM

    Energy Technology Data Exchange (ETDEWEB)

    Aoki, J.; Hada, T.; Pesce, A.; Akutsu, T.; Matsuda, S. [National Space Development Agency of Japan, Tsukuba, Ibaraki (Japan). Tsukuba Space Center; Igarashi, T.; Baba, S.

    1997-03-01

    Beam Blanking SEM (Scanning Electron Microscope) testing technique has been applied to CMOS SRAM devices to evaluate the occurence of soft errors on memory cells. Cross-section versus beam current and LET curves derived from BBSEM and heavy ion testing technique, respectively, have been compared. A linear relation between BBSEM current and heavy ion LET has been found. The purpose of this study was to demonstrate that the application of focused pulsed electron beam could be a reliable, convenient and inexpensive tool to investigate the effects of heavy ions and high energy particles on memory devices for space application. (author)

  7. A Retrofit Technique for Kicker Beam-Coupling Impedance Reduction

    CERN Document Server

    Caspers, Friedhelm; Kroyer, T; Timmins, M; Uythoven, J; Kurennoy, S

    2004-01-01

    The reduction of the impedance of operational ferrite kicker structures may be desirable in order to avoid rebuilding such a device. Often resistively coated ceramic plates or tubes are installed for this purpose but at the expense of available aperture. Ceramic U-shaped profiles with a resistive coating fitting between the ellipse of the beam and the rectangular kicker aperture have been used to significantly reduce the impedance of the magnet, while having a limited effect on the available physical aperture. Details of this method, constraints, measurements and simulation results as well as practical aspects are presented and discussed.

  8. Chemical reactions on solid surfaces using molecular beam techniques

    Science.gov (United States)

    Palmer, R. L.

    1980-07-01

    Thermal energy molecular beams have been used to study chemical interactions with metal surfaces. Chemisorption of simple molecules such as H2, O2, CH4, C2Hx and CO was investigated on single and polycrystalline surfaces of Pt, Ni, Co, and Ag. Kinetic parameters and reaction mechanisms were determined for model catalytic reactions including CO and C2Hx oxidation and methanation from H2/CO mixtures. Chemical reactions of NOx with CO and D2 on Pt(111) and other surfaces have been surveyed and the kinetics of NO and O2 chemisorption have been measured. The theory of adsorption/desorption kinetics is reviewed and certain deficiencies identified.

  9. Dense and high-stability Ti2AlN MAX phase coatings prepared by the combined cathodic arc/sputter technique

    Science.gov (United States)

    Wang, Zhenyu; Liu, Jingzhou; Wang, Li; Li, Xiaowei; Ke, Peiling; Wang, Aiying

    2017-02-01

    Ti2AlN belongs to a family of ternary nano-laminate alloys known as the MAX phases, which exhibit a unique combination of metallic and ceramic properties. In the present work, the dense and high-stability Ti2AlN coating has been successfully prepared through the combined cathodic arc/sputter deposition, followed by heat post-treatment. It was found that the as-deposited Ti-Al-N coating behaved a multilayer structure, where (Ti, N)-rich layer and Al-rich layer grew alternately, with a mixed phase constitution of TiN and TiAlx. After annealing at 800 °C under vacuum condition for 1.5 h, although the multilayer structure still was found, part of multilayer interfaces became indistinct and disappeared. In particular, the thickness of the Al-rich layer decreased in contrast to that of as-deposited coating due to the inner diffusion of the Al element. Moreover, the Ti2AlN MAX phase emerged as the major phase in the annealed coatings and its formation mechanism was also discussed in this study. The vacuum thermal analysis indicated that the formed Ti2AlN MAX phase exhibited a high-stability, which was mainly benefited from the large thickness and the dense structure. This advanced technique based on the combined cathodic arc/sputter method could be extended to deposit other MAX phase coatings with tailored high performance like good thermal stability, high corrosion and oxidation resistance etc. for the next protective coating materials.

  10. Integration of in situ RHEED with magnetron sputter deposition for atomic layer controlled growth

    Science.gov (United States)

    Podkaminer, Jacob P.

    Epitaxial thin films continue to be one of the most promising topics within electronic materials research. Sputter deposition is one process by which these films can be formed and is a widely used growth technique for a large range of technologically important material systems. Epitaxial films of carbides, nitrides, metals, oxides and more can all be formed during the sputter process which offers the ability to deposit smooth and uniform films from the research level up to an industrial scale. This tunable kinematic deposition process excels in easily adapting for a large range of environments and growth procedures. Despite the vast advantages associated with sputter deposition, there is a significant lack of in situ analysis options during sputtering. In particular, the area of real time atomic layer control is severely deficient. Atomic layer controlled growth of epitaxial thin films and artificially layered superlattices is critical for both understanding their emergent phenomena and engineering novel material systems and devices. Reflection high-energy electron diffraction (RHEED) is one of the most common in situ analysis techniques during thin film deposition that is rarely used during sputtering due to the strong permanent magnets in magnetron sputter sources and their effect on the RHEED electron beam. In this work we have solved this problem and designed a novel way to deter the effect of the magnets for a wide range of growth geometries and demonstrate the ability for the first time to have layer by layer control during sputter deposition by in situ RHEED. A novel growth chamber that can seamlessly change between pulsed laser deposition and sputtering with RHEED for the growth of complex heterostructures has been designed and implemented. Epitaxial thin films of LaAlO3, La1-xSrxMnO3, and SrRuO3 have all been deposited by sputtering and shown to exhibit clear and extended RHEED oscillations. To solve the magnet issue, a finite element model has been

  11. Electro-optic techniques in electron beam diagnostics

    Energy Technology Data Exchange (ETDEWEB)

    van Tilborg, Jeroen; Toth, Csaba; Matlis, Nicholas; Plateau, Guillaume; Leemans, Wim

    2011-06-17

    Electron accelerators such as laser wakefield accelerators, linear accelerators driving free electron lasers, or femto-sliced synchrotrons, are capable of producing femtosecond-long electron bunches. Single-shot characterization of the temporal charge profile is crucial for operation, optimization, and application of such accelerators. A variety of electro-optic sampling (EOS) techniques exists for the temporal analysis. In EOS, the field profile from the electron bunch (or the field profile from its coherent radiation) will be transferred onto a laser pulse co-propagating through an electro-optic crystal. This paper will address the most common EOS schemes and will list their advantages and limitations. Strong points that all techniques share are the ultra-short time resolution (tens of femtoseconds) and the single-shot capabilities. Besides introducing the theory behind EOS, data from various research groups is presented for each technique.

  12. Magnetron sputtering source

    Science.gov (United States)

    Makowiecki, Daniel M.; McKernan, Mark A.; Grabner, R. Fred; Ramsey, Philip B.

    1994-01-01

    A magnetron sputtering source for sputtering coating substrates includes a high thermal conductivity electrically insulating ceramic and magnetically attached sputter target which can eliminate vacuum sealing and direct fluid cooling of the cathode assembly. The magnetron sputtering source design results in greater compactness, improved operating characteristics, greater versatility, and low fabrication cost. The design easily retrofits most sputtering apparatuses and provides for safe, easy, and cost effective target replacement, installation, and removal.

  13. Characterization of a radioactive {sup 11}C beam by means of the associated particle technique

    Energy Technology Data Exchange (ETDEWEB)

    Varela, A.; Policroniades, R.; Murillo, G.; Moreno, E. [ININ, Laboratorio del Acelerador Tandem, Carretera Mexico-Toluca s/n, Ocoyoacac 52750, Estado de Mexico (Mexico); Huerta, A.; Chavez, E.; Ortiz, M. E.; Barron, L.; Curiel, Q. [UNAM, Instituto de Fisica, Circuito Exterior, Ciudad Universitaria, 04510 Mexico D. F. (Mexico); Aguilar, C.; Coello, E. A.; Juarez, M. A.; Martinez, J. N. [UNAM, Facultad de Ciencias, Circuito Exterior, Ciudad Universitaria, 04510 Mexico D. F. (Mexico)

    2010-02-15

    This paper describes the results obtained for the production and characterization of a radioactive {sup 11}C beam, by means of the in flight technique and the tandem laboratory of the National Institute of Nuclear Research, Mexico. The {sup 11}C production technique described here, uses the well known associated particle technique with the reaction {sup 2}H({sup 10}B, {sup 11}C)n, in order to obtain a bi univocal correspondence between the radioactive {sup 11}C particles and the associated neutrons. A discussion concerning the possible use of this {sup 11}C beam in the study of the elastic scattering of protons is introduced. (Author)

  14. Fiber microaxicons fabricated by a polishing technique for the generation of Bessel-like beams.

    Science.gov (United States)

    Grosjean, Thierry; Saleh, Said Sadat; Suarez, Miguel Angel; Ibrahim, Idriss Abdoulkader; Piquerey, Vincent; Charraut, Daniel; Sandoz, Patrick

    2007-11-20

    We report a simple method for generating microaxicons at the extremity of commercial optical fibers. The proposed solution, based on a polishing technique, can readily produce any desired microaxicon cone angle and is independent of the nature of the fiber. An optical study of microaxicon performance, in terms of confinement ability and length of the generated Bessel-like beams, is presented as a function of the microaxicon angle. This study, made possible by the experimental acquisition of the 3D light distribution of the Bessel-like beams, reveals the relationship between the Bessel-like beam confinement zone and the beam length. Finally, the effect of diffraction of the Bessel-like beams, induced by the limited lateral extent of the incident fiber mode, is studied and discussed.

  15. Design and Simulation of Symmetric Nanostructures Using Two-beam Modulated Interference Lithography Technique

    CERN Document Server

    Raj, A Alfred Kiruba; Devaprakasam, D

    2013-01-01

    Interferometry lithography is a maturing technology for patterning sub-micron structures in arrays covering large areas. This paper presents a method for the measurement of nanoscale surface patterns produced by two-beam laser interference lithography (LIL). The objective in this study is to simulate and design periodic and quasi-periodic 1D, 2D and 3D nanostructures using two-beam interference technique. We designed and simulated periodic and quasi-periodic structures by two-beam interference patterning using a MATLAB program by varying angle of incidence, wavelength and geometry. The simulated patterns show that the symmetries of the interference maxima depend mostly on the angles of incidence and perturbations of incidents beams. Using this technique, we can achieve potentially high-volume of uniformity, throughput, process control, and repeatability. By varying different input parameters, we have optimized simulated patterns with controlled periodicity, density and aspect ratio also it can be programmed t...

  16. Transverse superresolution technique involving rectified Laguerre-Gaussian LG(p)⁰ beams.

    Science.gov (United States)

    Cagniot, Emmanuel; Fromager, Michael; Godin, Thomas; Passilly, Nicolas; Aït-Ameur, Kamel

    2011-08-01

    A promising technique has been proposed recently [Opt. Commun. 284, 1331 (2011), Opt. Commun. 284, 4107 (2011)] for breaking the diffraction limit of light. This technique consists of transforming a symmetrical Laguerre-Gaussian LG(p)⁰ beam into a near-Gaussian beam at the focal plane of a thin converging lens thanks to a binary diffractive optical element (DOE) having a transmittance alternatively equal to -1 or +1, transversely. The effect of the DOE is to convert the alternately out-of-phase rings of the LG(p)⁰ beam into a unified phase front. The benefits of the rectified beam at the lens focal plane are a short Rayleigh range, which is very useful for many laser applications, and a focal volume much smaller than that obtained with a Gaussian beam. In this paper, we demonstrate numerically that the central lobe's radius of the rectified beam at the lens focal plane depends exclusively on the dimensionless radial intensity vanishing factor of the incident beam. Consequently, this value can be easily predicted.

  17. A feasibility study of H sup - beam extraction technique using YAG laser

    CERN Document Server

    Meigo, S I; Hasegawa, K; Ikeda, Y; Nakagawa, S; Oigawa, H

    2002-01-01

    Under a framework of JAERI-KEK joint project of high intensity proton accelerator, as for research and develop of the accelerator driven nuclear transmutation of the long lived radioactive nuclide, it is planed to built the Transmutation Physics Experiment Facility (TEF-P) and the Transmutation Engineering Experiment Facility (TEF-E). The TEF-P is used for the experiments for subcritical system coupled with a spallation neutron target bombarded with 600-MeV proton beam accelerated by the LINAC. To limit the maximum thermal power less than 500 W at the TEF-P, an incident beam power should be less than 10 W. On the contrary, at the TEF-E, high power beam of 200 kW is requested. Both high and low power beams are demanded for the transmutation facilities. It is difficult to deliver a low power beam to the TEF-P. Conventional beam extraction technique with a thin foil, is not desirable because the scattering of the beam at the foil requires the massive shield. Therefore, we study a new technique to extract a small...

  18. Flexible core masking technique for beam halo measurements with high dynamic range

    Energy Technology Data Exchange (ETDEWEB)

    Egberts, J [Max Planck Institute for Nuclear Physics, Saupfercheckweg 1, D-69117 Heidelberg (Germany); Welsch, C P, E-mail: Carsten.Welsch@quasar-group.co [Cockcroft Institute, Daresbury Science and Innovation Campus, WA4 4AD Warrington (United Kingdom)

    2010-04-15

    A thorough understanding of halo formation and its possible control is highly desirable for essentially all particle accelerators. Particles outside the beam core are not only lost for further experiments, they are also likely to hit the beam pipe, and activate this, as well as accelerator and experimental components in close proximity, which makes work on the accelerator costly and time consuming. Well established techniques for transverse beam profile measurements of electron or high energy hadron beams are the observation of synchrotron radiation, optical transition radiation or the like. A particular challenge, however, is the detection of particles in the tail regions of the beam distribution in close proximity of the very intense beam core. Results from laboratory measurements on two different devices are presented that might form the technical base of a future beam halo monitor: the novel SpectraCam XDR camera system which has an intrinsically high dynamic range due to its unique pixel design, and a flexible masking technique based on a DMD micro mirror array which allows for a fast mask generation to blank out the central core.

  19. Nuclear techniques using radioactive beams for biophysical studies

    CERN Document Server

    Stachura, Monika Kinga

    Perturbed angular correlation of "-rays (PAC) spectroscopy and nuclear magnetic resonance measured by !-decay (betaNMR) spectroscopy are two very sensitive and, among life-scientists, infrequently encountered nuclear techniques. Both of them belong to the family of hyperfine techniques, which allow for measurements of the interactions of extra-nuclear electromagnetic fields with the nuclear moments. In this way - they can provide useful information about the local structure of the investigated systems. The first part of the work presented here focuses on investigating the fundamental chemistry of heavy metal ion - protein interactions mainly with PAC spectroscopy. A variety of questions concerning both the function of metal ions in natural systems and in synthetic biomolecules on the one hand and the toxic effects of some metal ions on the other were addressed, the results of which are described in four different papers. Paper I is a review article entitled ”Selected applications of perturbed angular correl...

  20. Hybrid single-beam reconstruction technique for slow and fast varying wave fields.

    Science.gov (United States)

    Falaggis, Konstantinos; Kozacki, Tomasz; Kujawinska, Malgorzata

    2015-06-01

    An iterative single-beam wave field reconstruction technique that employs both non-paraxial, wave propagation based and paraxial deterministic phase retrieval techniques is presented. This approach overcomes two major obstacles that exist in the current state of the art techniques: iterative methods do not reconstruct slowly varying wave fields due to slow convergence and stagnation, and deterministic methods have paraxial limits, making the reconstructions of quickly varying object features impossible. In this work, a hybrid approach is reported that uses paraxial wave field corrections within iterative phase retrieval solvers. This technique is suitable for cases ranging from slow to fast varying wave fields, and unlike the currently available methods, can also reconstruct measurement objects with different regions of both slowly and quickly varying object features. It is further shown that this technique gives a higher accuracy than current single-beam phase retrieval techniques, and in comparison to the iterative methods, has a higher convergence speed.

  1. Sensitivity optimization of the one beam Z-scan technique and a Z-scan technique immune to nonlinear absorption.

    Science.gov (United States)

    Dávila Pintle, José A; Lara, Edmundo Reynoso; Iturbe Castillo, Marcelo D

    2013-07-01

    It is presented a criteria for selecting the optimum aperture radius for the one beam Z-scan technique (OBZT), based on the analysis of the transmittance of the aperture. It is also presented a modification to the OBZT by directly measuring the beam radius in the far field with a rotating disk, which allows to determine simultaneously the non-linear absorptive coefficient and non-linear refractive index, much less sensitive to wave front distortions caused by inhomogeneities of the sample with a negligible loss of signal to noise ratio. It is demonstrated its equivalence to the OBZT.

  2. RF sputtering: A viable tool for MEMS fabrication

    Indian Academy of Sciences (India)

    Sudhir Chandra; Vivekanand Bhatt; Ravindra Singh

    2009-08-01

    Fabrication of Micro-Electro-Mechanical-Systems (MEMS) requires deposition of films such as SiO2, Si34, ZnO, polysilicon, phosphosilicate glass (PSG), Al, Cr-Au, Pt, etc. for use as structural, sacrificial, piezoelectric and conducting material. Deposition of these materials at low temperature is desirable for fabricating sensors/actuators on temperature-sensitive substrates and also for integrating MEMS structures on silicon in post-CMOS processing procedures. Plasma enhanced chemical vapour deposition (PECVD) and sputtering are amongst potential techniques for preparing films for MEMS fabrication at comparatively low temperatures. The sputtering technique has an added advantage that the process is carried out in an inert ambient (argon) and chemically sensitive substrate/sacrificial layers can be used in realization of MEMS. Furthermore, the same system can be used for depositing dielectric, piezoelectric and conducting materials as per requirement in the fabrication sequence. This enables rapid low-cost prototyping of MEMS with minimum fabrication facilities. In the present work, we report preparation, characterization and application of RF sputtered SiO2, Si34 and ZnO films for MEMS fabrication. The effect of RF power, sputtering pressure and target-to-substrate spacing was investigated on the structural and other properties of the films. The residual stress in the films was obtained using wafer curvature measurement technique. The deposition parameters are optimized to obtain low stress films of SiO2 and Si34. The self-heating of the substrate during deposition was advantageously exploited to obtain highly -axis oriented films of ZnO without any external heating. A variety of MEMS structures such as cantilever beams, micro-bridges, diaphragms, etc. are demonstrated using bulk, surface and surface-bulk micromachining techniques.

  3. Real-time and in situ monitoring of sputter deposition with RHEED for atomic layer controlled growth

    Directory of Open Access Journals (Sweden)

    J. P. Podkaminer

    2016-08-01

    Full Text Available Sputter deposition is a widely used growth technique for a large range of important material systems. Epitaxial films of carbides, nitrides, metals, oxides and more can all be formed during the sputter process which offers the ability to deposit smooth and uniform films from the research level up to an industrial scale. This tunable kinematic deposition process excels in easily adapting for a large range of environments and growth procedures. Despite the vast advantages, there is a significant lack of in situ analysis options during sputtering. In particular, the area of real time atomic layer control is severely deficient. Atomic layer controlled growth of epitaxial thin films and artificially layered superlattices is critical for both understanding their emergent phenomena and engineering novel material systems and devices. Reflection high-energy electron diffraction (RHEED is one of the most common in situ analysis techniques during thin film deposition that is rarely used during sputtering due to the effect of the strong permanent magnets in magnetron sputter sources on the RHEED electron beam. In this work we have solved this problem and designed a novel way to deter the effect of the magnets for a wide range of growth geometries and demonstrate the ability for the first time to have layer-by-layer control during sputter deposition by in situ RHEED.

  4. Real-time and in situ monitoring of sputter deposition with RHEED for atomic layer controlled growth

    Science.gov (United States)

    Podkaminer, J. P.; Patzner, J. J.; Davidson, B. A.; Eom, C. B.

    2016-08-01

    Sputter deposition is a widely used growth technique for a large range of important material systems. Epitaxial films of carbides, nitrides, metals, oxides and more can all be formed during the sputter process which offers the ability to deposit smooth and uniform films from the research level up to an industrial scale. This tunable kinematic deposition process excels in easily adapting for a large range of environments and growth procedures. Despite the vast advantages, there is a significant lack of in situ analysis options during sputtering. In particular, the area of real time atomic layer control is severely deficient. Atomic layer controlled growth of epitaxial thin films and artificially layered superlattices is critical for both understanding their emergent phenomena and engineering novel material systems and devices. Reflection high-energy electron diffraction (RHEED) is one of the most common in situ analysis techniques during thin film deposition that is rarely used during sputtering due to the effect of the strong permanent magnets in magnetron sputter sources on the RHEED electron beam. In this work we have solved this problem and designed a novel way to deter the effect of the magnets for a wide range of growth geometries and demonstrate the ability for the first time to have layer-by-layer control during sputter deposition by in situ RHEED.

  5. Beam rate influence on dose distribution and fluence map in IMRT dynamic technique.

    Science.gov (United States)

    Slosarek, Krzysztof; Grządziel, Aleksandra; Osewski, Wojciech; Dolla, Lukasz; Bekman, Barbara; Petrovic, Borislava

    2012-01-01

    To examine the impact of beam rate on dose distribution in IMRT plans and then to evaluate agreement of calculated and measured dose distributions for various beam rate values. Accelerators used in radiotherapy utilize some beam rate modes which can shorten irradiation time and thus reduce ability of patient movement during a treatment session. This aspect should be considered in high conformal dynamic techniques. Dose calculation was done for two different beam rates (100 MU/min and 600 MU/min) in an IMRT plan. For both, a comparison of Radiation Planning Index (RPI) and MU was conducted. Secondly, the comparison of optimal fluence maps and corresponding actual fluence maps was done. Next, actual fluence maps were measured and compared with the calculated ones. Gamma index was used for that assessment. Additionally, positions of each leaf of the MLC were controlled by home made software. Dose distribution obtained for lower beam rates was slightly better than for higher beam rates in terms of target coverage and risk structure protection. Lower numbers of MUs were achieved in 100 MU/min plans than in 600 MU/min plans. Actual fluence maps converted from optimal ones demonstrated more similarity in 100 MU/min plans. Better conformity of the measured maps to the calculated ones was obtained when a lower beam rate was applied. However, these differences were small. No correlation was found between quality of fluence map conversion and leaf motion accuracy. Execution of dynamic techniques is dependent on beam rate. However, these differences are minor. Analysis shows a slight superiority of a lower beam rate. It does not significantly affect treatment accuracy.

  6. Precision Atomic Physics Techniques for Nuclear Physics with Radioactive Beams

    CERN Document Server

    Blaum, Klaus; Nörtershäuser, Wilfried

    2012-01-01

    Atomic physics techniques for the determination of ground-state properties of radioactive isotopes are very sensitive and provide accurate masses, binding energies, Q-values, charge radii, spins, and electromagnetic moments. Many fields in nuclear physics benefit from these highly accurate numbers. They give insight into details of the nuclear structure for a better understanding of the underlying effective interactions, provide important input for studies of fundamental symmetries in physics, and help to understand the nucleosynthesis processes that are responsible for the observed chemical abundances in the Universe. Penning-trap and and storage-ring mass spectrometry as well as laser spectroscopy of radioactive nuclei have now been used for a long time but significant progress has been achieved in these fields within the last decade. The basic principles of laser spectroscopic investigations, Penning-trap and storage-ring mass measurements of short-lived nuclei are summarized and selected physics results a...

  7. Structural and optical properties of a-Si{sub 1-x}C{sub x}:H films synthesized by dc magnetron sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Keffous, Aissa, E-mail: keffousa@yahoo.fr [Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers (Algeria); Cheriet, Abdelhak; Belkacem, Youcef; Gabouze, Noureddine; Boukezzata, Assia; Boukennous, Yacine [Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers (Algeria); Brighet, Amer; Cherfi, Rabah; Kechouane, Mohamed [Houari Boumediene Science and Technology University (USTHB), Physics Faculty, Algiers (Algeria); Guerbous, Lakhdar [Algerian Nuclear Research Center (CRNA), Algiers (Algeria); Menous, Isa; Menari, Hamid [Silicon Technology Development Unit (UDTS), 02 Bd, Frantz FANON, B.P. 140, Algiers (Algeria)

    2010-05-01

    Hydrogenated amorphous SiC films (a-Si{sub 1-x}C{sub x}:H) were prepared by dc magnetron sputtering technique on p-type Si(1 0 0) and corning 9075 substrates at low temperature, by using 32 sprigs of silicon carbide (6H-SiC). The deposited a-Si{sub 1-x}C{sub x}:H film was realized under a mixture of argon and hydrogen gases. The a-Si{sub 1-x}C{sub x}:H films have been investigated by scanning electronic microscopy equipped with an EDS system (SEM-EDS), X-ray diffraction (XRD), secondary ions mass spectrometry (SIMS), Fourier transform infrared spectroscopy (FTIR), UV-vis-IR spectrophotometry, and photoluminescence (PL). XRD results showed that the deposited film was amorphous with a structure as a-Si{sub 0.80}C{sub 0.20}:H corresponding to 20 at.% carbon. The photoluminescence response of the samples was observed in the visible range at room temperature with two peaks centred at 463 nm (2.68 eV) and 542 nm (2.29 eV). In addition, the dependence of photoluminescence behaviour on film thickness for a certain carbon composition in hydrogenated amorphous SiC films (a-Si{sub 1-x}C{sub x}:H) has been investigated.

  8. Fabrication and characterization of He-charged ODS-FeCrNi films deposited by a radio-frequency plasma magnetron sputtering technique

    Science.gov (United States)

    Liang, SONG; Xianping, WANG; Le, WANG; Ying, ZHANG; Wang, LIU; Weibing, JIANG; Tao, ZHANG; Qianfeng, FANG; Changsong, LIU

    2017-04-01

    He-charged oxide dispersion strengthened (ODS) FeCrNi films were prepared by a radio-frequency (RF) plasma magnetron sputtering method in a He and Ar mixed atmosphere at 150 °C. As a comparison, He-charged FeCrNi films were also fabricated at the same conditions through direct current (DC) plasma magnetron sputtering. The doping of He atoms and Y2O3 in the FeCrNi films was realized by the high backscattered rate of He ions and Y2O3/FeCrNi composite target sputtering method, respectively. Inductive coupled plasma (ICP) and x-ray photoelectron spectroscopy (XPS) analysis confirmed the existence of Y2O3 in FeCrNi films, and Y2O3 content hardly changed with sputtering He/Ar ratio. Cross-sectional scanning electron microscopy (SEM) shows that the FeCrNi films were composed of dense columnar nanocrystallines and the thickness of the films was obviously dependent on He/Ar ratio. Nanoindentation measurements revealed that the FeCrNi films fabricated through DC/RF plasma magnetron sputtering methods exhibited similar hardness values at each He/Ar ratio, while the dispersion of Y2O3 apparently increased the hardness of the films. Elastic recoil detection (ERD) showed that DC/RF magnetron sputtered FeCrNi films contained similar He amounts (∼17 at.%). Compared with the minimal change of He level with depth in DC-sputtered films, the He amount decreases gradually in depth in the RF-sputtered films. The Y2O3-doped FeCrNi films were shown to exhibit much smaller amounts of He owing to the lower backscattering possibility of Y2O3 and the inhibition effect of nano-sized Y2O3 particles on the He element.

  9. Scintillation reduction using multi-beam propagating technique in atmospheric WOCDMA system

    Institute of Scientific and Technical Information of China (English)

    Yaqin Zhao; Danli Xu; Xin Zhong

    2011-01-01

    Wireless optical code division multiple access (WOCDMA) combines code division multiple access (CDMA) with wireless-optic communications.It can not only reserve the advantage of CDMA technology in radio frequency (RF) communication,but also use huge bandwidth and have simple network protocol,random access,and other characteristics.%We propose employing multi-beam propagating technology to mitigate the influence of atmospheric scintillation to the wireless optical code division multiple access (WOCDMA) system and then deduce the bit error rate (BER) formulas of systems in weak and strong scintillations, respectively. According to simulation experiment results, multi-beam propagation can improve the system performance very well compared with single-beam propagating technique. Moreover, the more beams we use, the better the performance we get. When the received optical power is -30 dBm, the BER of the system employing four beams is 5 and 1 dB lower than that of using single-beam propagating technique in weak and strong scintillations, respectively.

  10. The edge transient-current technique (E-TCT) with high energy hadron beam

    Science.gov (United States)

    Gorišek, Andrej; Cindro, Vladimir; Kramberger, Gregor; Mandić, Igor; Mikuž, Marko; Muškinja, Miha; Zavrtanik, Marko

    2016-09-01

    We propose a novel way to investigate the properties of silicon and CVD diamond detectors for High Energy Physics experiments complementary to the already well-established E-TCT technique using laser beam. In the proposed setup the beam of high energy hadrons (MIPs) is used instead of laser beam. MIPs incident on the detector in the direction parallel to the readout electrode plane and perpendicular to the edge of the detector. Such experiment could prove very useful to study CVD diamond detectors that are almost inaccessible for the E-TCT measurements with laser due to large band-gap as well as to verify and complement the E-TCT measurements of silicon. The method proposed is being tested at CERN in a beam of 120 GeV hadrons using a reference telescope with track resolution at the DUT of few μm. The preliminary results of the measurements are presented.

  11. The edge transient-current technique (E-TCT) with high energy hadron beam

    Energy Technology Data Exchange (ETDEWEB)

    Gorišek, Andrej; Cindro, Vladimir; Kramberger, Gregor; Mandić, Igor [J. Stefan Institute, Ljubljana (Slovenia); Mikuž, Marko [J. Stefan Institute, Ljubljana (Slovenia); University of Ljubljana (Slovenia); Muškinja, Miha; Zavrtanik, Marko [J. Stefan Institute, Ljubljana (Slovenia)

    2016-09-21

    We propose a novel way to investigate the properties of silicon and CVD diamond detectors for High Energy Physics experiments complementary to the already well-established E-TCT technique using laser beam. In the proposed setup the beam of high energy hadrons (MIPs) is used instead of laser beam. MIPs incident on the detector in the direction parallel to the readout electrode plane and perpendicular to the edge of the detector. Such experiment could prove very useful to study CVD diamond detectors that are almost inaccessible for the E-TCT measurements with laser due to large band-gap as well as to verify and complement the E-TCT measurements of silicon. The method proposed is being tested at CERN in a beam of 120 GeV hadrons using a reference telescope with track resolution at the DUT of few μm. The preliminary results of the measurements are presented.

  12. Sensitivity enhancement of surface thermal lens technique with a short-wavelength probe beam: Experiment

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Xiaorong [Institute of Optics and Electronics, Chinese Academy of Sciences and Key Laboratory of Optical Engineering, Chinese Academy of Sciences, Chengdu 610209 (China); University of Chinese Academy of Sciences, Beijing 100049 (China); Li, Bincheng [Institute of Optics and Electronics, Chinese Academy of Sciences and Key Laboratory of Optical Engineering, Chinese Academy of Sciences, Chengdu 610209 (China)

    2015-02-15

    Surface thermal lens is a highly sensitive photothermal technique to measure low absorption losses of various solid materials. In such applications, the sensitivity of surface thermal lens is a key parameter for measuring extremely low absorption. In this paper, we experimentally investigated the influence of probe beam wavelength on the sensitivity of surface thermal lens for measuring the low absorptance of optical laser components. Three probe lasers with wavelength 375 nm, 633 nm, and 1570 nm were used, respectively, to detect the surface thermal lens amplitude of a highly reflective coating sample excited by a cw modulated Gaussian beam at 1064 nm. The experimental results showed that the maximum amplitude of surface thermal lens signal obtained at corresponding optimized detection distance was inversely proportional to the wavelength of the probe beam, as predicted by previous theoretical model. The sensitivity of surface thermal lens could, therefore, be improved by detecting surface thermal lens signal with a short-wavelength probe beam.

  13. Development of ion beam techniques for the study of special nuclear materials related problems

    Energy Technology Data Exchange (ETDEWEB)

    Maggiore, C.J.; Tesmer, J.R.; Martz, J.C. [and others

    1998-11-01

    This is the final report of a three-year, Laboratory Directed Research and Development (LDRD) project at the Los Alamos National Laboratory (LANL). The scientific objective of this project was to develop the ion beam techniques for the characterization of actinides and their effects on other materials. It was designed to enhance their ability to quantitatively understand the oxidation, corrosion, diffusion, stability, and radiation damage of actinides and the materials with which they are in contact. The authors developed and applied several low-energy nuclear techniques (resonant and nonresonant backscattering, nuclear reaction analysis, and particle-induced x-ray emission) to the quantitative study of the near surfaces of actinide and tritide materials, and determined the absolute accuracy and precision of ion beam measurements on these materials. They also demonstrated the use of variable-energy alpha beams for the study of accelerated aging of polymeric materials in contact with actinide materials.

  14. Application of real-time digitization techniques in beam measurement for accelerators

    Science.gov (United States)

    Zhao, Lei; Zhan, Lin-Song; Gao, Xing-Shun; Liu, Shu-Bin; An, Qi

    2016-04-01

    Beam measurement is very important for accelerators. In this paper, modern digital beam measurement techniques based on IQ (In-phase & Quadrature-phase) analysis are discussed. Based on this method and high-speed high-resolution analog-to-digital conversion, we have completed three beam measurement electronics systems designed for the China Spallation Neutron Source (CSNS), Shanghai Synchrotron Radiation Facility (SSRF), and Accelerator Driven Sub-critical system (ADS). Core techniques of hardware design and real-time system calibration are discussed, and performance test results of these three instruments are also presented. Supported by National Natural Science Foundation of China (11205153, 10875119), Knowledge Innovation Program of the Chinese Academy of Sciences (KJCX2-YW-N27), and the Fundamental Research Funds for the Central Universities (WK2030040029),and the CAS Center for Excellence in Particle Physics (CCEPP).

  15. Three-dimensional microstructural characterization of bulk plutonium and uranium metals using focused ion beam technique

    Science.gov (United States)

    Chung, Brandon W.; Erler, Robert G.; Teslich, Nick E.

    2016-05-01

    Nuclear forensics requires accurate quantification of discriminating microstructural characteristics of the bulk nuclear material to identify its process history and provenance. Conventional metallographic preparation techniques for bulk plutonium (Pu) and uranium (U) metals are limited to providing information in two-dimension (2D) and do not allow for obtaining depth profile of the material. In this contribution, use of dual-beam focused ion-beam/scanning electron microscopy (FIB-SEM) to investigate the internal microstructure of bulk Pu and U metals is demonstrated. Our results demonstrate that the dual-beam methodology optimally elucidate microstructural features without preparation artifacts, and the three-dimensional (3D) characterization of inner microstructures can reveal salient microstructural features that cannot be observed from conventional metallographic techniques. Examples are shown to demonstrate the benefit of FIB-SEM in improving microstructural characterization of microscopic inclusions, particularly with respect to nuclear forensics.

  16. A Technique for Temperature and Ultimate Load Calculations of Thin Targets in a Pulsed Electron Beam

    DEFF Research Database (Denmark)

    Hansen, Jørgen-Walther; Lundsager, Per

    1979-01-01

    A technique is presented for the calculation of transient temperature distributions and ultimate load of rotationally symmetric thin membranes with uniform lateral load and exposed to a pulsed electron beam from a linear accelerator. Heat transfer by conduction is considered the only transfer...

  17. A hybrid electron cyclotron resonance metal ion source with integrated sputter magnetron for the production of an intense Al{sup +} ion beam

    Energy Technology Data Exchange (ETDEWEB)

    Weichsel, T., E-mail: tim.weichsel@fep.fraunhofer.de; Hartung, U.; Kopte, T. [Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, 01277 Dresden (Germany); Zschornack, G. [Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany); Kreller, M.; Philipp, A. [DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)

    2015-09-15

    A metal ion source prototype has been developed: a combination of magnetron sputter technology with 2.45 GHz electron cyclotron resonance (ECR) ion source technology—a so called magnetron ECR ion source (MECRIS). An integrated ring-shaped sputter magnetron with an Al target is acting as a powerful metal atom supply in order to produce an intense current of singly charged metal ions. Preliminary experiments show that an Al{sup +} ion current with a density of 167 μA/cm{sup 2} is extracted from the source at an acceleration voltage of 27 kV. Spatially resolved double Langmuir probe measurements and optical emission spectroscopy were used to study the plasma states of the ion source: sputter magnetron, ECR, and MECRIS plasma. Electron density and temperature as well as Al atom density were determined as a function of microwave and sputter magnetron power. The effect of ECR heating is strongly pronounced in the center of the source. There the electron density is increased by one order of magnitude from 6 × 10{sup 9} cm{sup −3} to 6 × 10{sup 10} cm{sup −3} and the electron temperature is enhanced from about 5 eV to 12 eV, when the ECR plasma is ignited to the magnetron plasma. Operating the magnetron at constant power, it was observed that its discharge current is raised from 1.8 A to 4.8 A, when the ECR discharge was superimposed with a microwave power of 2 kW. At the same time, the discharge voltage decreased from about 560 V to 210 V, clearly indicating a higher plasma density of the MECRIS mode. The optical emission spectrum of the MECRIS plasma is dominated by lines of excited Al atoms and shows a significant contribution of lines arising from singly ionized Al. Plasma emission photography with a CCD camera was used to prove probe measurements and to identify separated plasma emission zones originating from the ECR and magnetron discharge.

  18. Squids, snakes, and polarimeters: A new technique for measuring the magnetic moments of polarized beams

    Energy Technology Data Exchange (ETDEWEB)

    Cameron, P.R.; Luccio, A.U.; Shea, T.J.; Tsoupas, N. [Brookhaven National Laboratory, Upton, New York 11973 (United States of America); Goldberg, D.A. [Lawrence Berkeley Laboratory, Berkeley, California (United States of America)

    1997-01-01

    Effective polarimetry at high energies in hadron and lepton synchrotrons has been a long-standing and difficult problem. In synchrotrons with polarized beams it is possible to cause the direction of the polarization vector of a given bunch to alternate at a frequency which is some subharmonic of the rotation frequency. This can result in the presence of lines in the beam spectrum which are due only to the magnetic moment of the beam and which are well removed from the various lines due to the charge of the beam. The magnitude of these lines can be calculated from first principles. They are many orders of magnitude weaker than the Schottky signals. Measurement of the magnitude of one of these lines would be an absolute measurement of beam polarization. For measuring magnetic field, the Superconducting Quantum Interference Device, or squid, is about five orders of magnitude more sensitive than any other transducer. Using a squid, such a measurement might be accomplished with the proper combination of shielding, pickup loop design, and filtering. The resulting instrument would be fast, non-destructive, and comparatively cheap. In addition, techniques developed in the creation of such an instrument could be used to measure the Schottky spectrum in unprecedented detail. We present specifics of a polarimeter design for the Relativistic Heavy Ion Collider (RHIC) and briefly discuss the possibility of using this technique to measure polarization at high-energy electron machines like LEP and HERA. {copyright} {ital 1997 American Institute of Physics.}

  19. Ion-sputtering deposition of Ca-P-O films for microscopic imaging of osteoblast cells

    Energy Technology Data Exchange (ETDEWEB)

    Ananda Sagari, A.R. [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland)]. E-mail: ananda.sagari@phys.jyu.fi; Lautaret, Claire [ENSICAEN, 6 Boulevard Marechal Juin, F-14050 CAEN Cedex 04 (France); Gorelick, Sergey [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Laitinen, Mikko [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Rahkila, Paavo [Department of Health Sciences, P.O. Box 35 (L), FIN-40014 University of Jyvaeskylae (Finland); Putkonen, Matti [Beneq Oy, Ensimmaeinen savu, FI-01510 Vantaa (Finland); Arstila, Kai [Instituut voor Kern- en Stralingsfysica, K.U.Leuven, Celestijnenlaan 200D, B-3001 Leuven (Belgium); Sajavaara, Timo [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland); Cheng, Sulin [Department of Health Sciences, P.O. Box 35 (L), FIN-40014 University of Jyvaeskylae (Finland); Whitlow, Harry J. [Department of Physics, P.O. Box 35 (YFL), FIN-40014 University of Jyvaeskylae (Finland)

    2007-08-15

    An ion-beam sputtering technique was used to produce Ca-P-O films on borosilicate glass at room temperature from hydroxyapatite targets using nitrogen, argon and krypton beams at different acceleration voltages. The sputtering target was pressed from high purity hydroxyapatite powder or mixture of high purity hydroxyapatite powder and red phosphorus in order to optimise the film composition. The film composition, determined using time-of-flight elastic recoil detection analysis (TOF-ERDA), was found to be strongly dependent on the ion energy used for deposition. By extra doping of the target with P the correct Ca/P atomic ratio in the deposited films was reached. The films deposited on Si were amorphous even after annealing at 800 deg, C. The biocompatibility of the films was investigated using osteoblast-like cells. The film deposited under optimal conditions exhibited dendritic growth, indicative of more realistic chemical signalling than for other substratum e.g. polystyrene or plain glass.

  20. Statistical signal processing techniques for coherent transversal beam dynamics in synchrotrons

    Energy Technology Data Exchange (ETDEWEB)

    Alhumaidi, Mouhammad

    2015-03-04

    identifying and analyzing the betatron oscillation sourced from the kick based on its mixing and temporal patterns. The accelerator magnets can generate unwanted spurious linear and non-linear fields due to fabrication errors or aging. These error fields in the magnets can excite undesired resonances leading together with the space charge tune spread to long term beam losses and reducing dynamic aperture. Therefore, the knowledge of the linear and non-linear magnets errors in circular accelerator optics is very crucial for controlling and compensating resonances and their consequent beam losses and beam quality deterioration. This is indispensable, especially for high beam intensity machines. Fortunately, the relationship between the beam offset oscillation signals recorded at the BPMs is a manifestation of the accelerator optics, and can therefore be exploited in the determination of the optics linear and non-linear components. Thus, beam transversal oscillations can be excited deliberately for purposes of diagnostics operation of particle accelerators. In this thesis, we propose a novel method for detecting and estimating the optics lattice non-linear components located in-between the locations of two BPMs by analyzing the beam offset oscillation signals of a BPMs-triple containing these two BPMs. Depending on the non-linear components in-between the locations of the BPMs-triple, the relationship between the beam offsets follows a multivariate polynomial accordingly. After calculating the covariance matrix of the polynomial terms, the Generalized Total Least Squares method is used to find the model parameters, and thus the non-linear components. A bootstrap technique is used to detect the existing polynomial model orders by means of multiple hypothesis testing, and determine confidence intervals for the model parameters.

  1. RF photo-injector beam energy distribution studies by slicing technique

    Energy Technology Data Exchange (ETDEWEB)

    Filippetto, D. [INFN-LNF, Via E. Fermi 40, Frascati, Rome (Italy); INFN-LNF, Via E. Fermi 40, Frascati, Rome (Italy)], E-mail: Daniele.Filippetto@lnf.infn.it; Bellaveglia, M. [INFN-LNF, Via E. Fermi 40, Frascati, Rome (Italy); Musumeci, P. [UCLA-Department of Physics and Astronomy, 405 Hilgard Avenue, Los Angeles, CA 90095 (United States); Ronsivalle, C. [ENEA, Via E. Fermi, 00044 Frascati, Rome (Italy)

    2009-07-01

    The SPARC photo-injector is an R and D facility dedicated to the production of high brightness electron beams for radiation generation via FEL or Thomson scattering processes. It is the prototype injector for the recently approved SPARX project, aiming at the construction in the Frascati/University of Rome Tor Vergata area of a new high brightness electron linac for the generation of SASE-FEL radiation in the 1-10 nm wavelength range. The first phase of the SPARC project has been dedicated to the e-beam source characterization; the beam transverse and longitudinal parameters at the exit of the gun have been measured, and the photo-injector settings optimized to achieve best performance. Several beam dynamics topics have been experimentally studied in this first phase of operation, as, for example, the effect of photocathode driver laser beam shaping and the evolution of the beam transverse emittance. These studies have been made possible by the use of a novel diagnostic tool, the 'emittance-meter' which enables the measurement of the transverse beam parameters at different positions along the propagation axis in the very interesting region at the exit of the RF gun. The new idea of extending the e-meter capabilities came out more recently. Information on the beam longitudinal phase space and correlations with the transverse planes can be retrieved by the slicing technique. In this paper, we illustrate the basic concept of the measurement together with simulations that theoretically validate the methodology. Some preliminary results are discussed and explained with the aid of code simulations.

  2. Study of YBaCo{sub 4}O{sub 7+{delta}} thin films grown by sputtering technique on (1012)-oriented sapphire substrates

    Energy Technology Data Exchange (ETDEWEB)

    Montoya, J.F.; Izquierdo, J.L. [Laboratorio de Materiales Ceramicos y Vitreos, Departamento de Fisica, Universidad Nacional de Colombia, Sede Medellin, A.A. 568, Medellin (Colombia); Gomez, A. [Laboratorio de Caracterizacion de Materiales, Facultad de Minas, Universidad Nacional de Colombia, Sede Medellin, A.A. 568, Medellin (Colombia); Arnache, O.; Osorio, J. [Grupo de Estado Solido, Departamento de Fisica, Universidad de Antioquia, A.A. 1226 Medellin (Colombia); Marin, J.; Paucar, C. [Laboratorio de Materiales Ceramicos y Vitreos, Departamento de Fisica, Universidad Nacional de Colombia, Sede Medellin, A.A. 568, Medellin (Colombia); Moran, O., E-mail: omoranc@unal.edu.c [Laboratorio de Materiales Ceramicos y Vitreos, Departamento de Fisica, Universidad Nacional de Colombia, Sede Medellin, A.A. 568, Medellin (Colombia)

    2011-03-01

    We report the growth of thin films of the cobaltite YBaCo{sub 4}O{sub 7+{delta}} by means of the dc magnetron sputtering technique at high oxygen pressure onto r (1012) sapphire substrates. The films were characterized according to their structural, morphological, electrical, magnetic, and optical properties. An analysis of the X-ray diffraction pattern indicates that the films grown on r-sapphire substrates are single phase polycrystalline. Despite the high growth temperature (850 {sup o}C), no indication of interface reaction (formation of BaAlO{sub 4} or Y{sub 2}O{sub 3}) is detected. Measurements of resistivity as a function of temperature reveal a semiconductor-like character of the grown films. No indication of possible transitions is observed in the temperature range 50-300 K. The electronic transport mechanism seems to be dominated by Mott variable range hopping (VRH) conduction. Fitting the VRH model to the experimental data allows one to estimate the density of states of the material at the Fermi level N(E{sub F}). The resistivity measured in magnetic fields as strong as 5 T increases notably, and positive magnetoresistance values as high as {approx} 60% at 100 K are obtained. Magnetization measurements show well defined hysteresis loops at 300 K and 5 K. Nevertheless, calculated values of the magnetization have ended up being too small for the ferro- or ferrimagnetic states. Raman spectra, in turn, allow one to identify bands associated with vibrating modes of CoO{sub 4} and YO{sub 6} in tetrahedral and octahedral configurations, respectively. Additional bands which seem to stem from Co ions in octahedral configuration are also clearly identified. Measurements of transmittance and reflectance show two well defined energy gaps at 3.7 and 2.2 eV.

  3. Characterization of a seeded pulsed molecular beam using the velocity map imaging technique

    Science.gov (United States)

    Lietard, Aude; Poisson, Lionel; Mestdagh, Jean-Michel; Gaveau, Marc-André

    2016-11-01

    An experimental study has been performed to characterize the density and the velocity distribution in a pulsed molecular beam generated by a source associating a pulsed valve and an oven placed just downstream. In its operating mode, the flow is alternatively in a supersonic and effusive regime. The Velocity Map Imaging (VMI) technique associated with laser ionization allows measuring the velocity distribution and the density of molecules as a function of time during the expansion. It gives us a very precise insight into the structure of the molecule bunch, and therefore into the nature of the expansion from which the molecular beam is extracted.

  4. A novel technique for tuning of co-axial cavity of multi-beam klystron

    Energy Technology Data Exchange (ETDEWEB)

    Saha, Sukalyan, E-mail: sstechno18@gmail.com; Bandyopadhyay, Ayan Kumar; Pal, Debashis; Kant, Deepender; Joshi, Lalit Mohan; Kumar, Bijendra; Meena, Rakesh; Rawat, Vikram [Microwave Tubes Division, CSIR-CEERI, Pilani, Rajasthan-333031 (India)

    2016-03-09

    Multi-beam Klystrons (MBKs) have gained wide acceptances in the research sector for its inherent advantages. But developing a robust tuning technique for an MBK cavity of coaxial type has still remained a challenge as these designs are very prone to suffer from asymmetric field distribution with inductive tuning of the cavity. Such asymmetry leads to inhomogeneous beam-wave interaction, an undesirable phenomenon. Described herein is a new type of coaxial cavity that has the ability to suppress the asymmetry, thereby allowing tuning of the cavity with a single tuning post.

  5. Investigation of Ni-Cr-Si-Fe-B coatings produced by the electron beam cladding technique

    Science.gov (United States)

    Zimogliadova, T. A.; Drobyaz, E. A.; Golkovskii, M. G.; Bataev, V. A.; Durakov, V. G.; Cherkasova, N. Yu

    2016-11-01

    This paper presents the results of structural investigations and results of tribological and microhardness tests of the coating obtained by electron beam cladding of a Ni-Cr-Si-Fe-B self-fluxing alloy on low-carbon steel. After electron beam treatment high-quality dense layer with a thickness of 1.2-1.8 mm was obtained. The structure of the coating consisted of dendrite crystals based on y-Ni-solid solution and eutectic with complex composition. Microhardness of the coating achieves 370 HV. Wear-resistance of the coating obtained by electron-beam cladding technique was 1.6-fold higher than that of low-carbon carburized steel.

  6. Characterization of beam dynamics in the APS injector rings using time-resolved imaging techniques

    Energy Technology Data Exchange (ETDEWEB)

    Yang, B.X.; Lumpkin, A.H.; Borland, M. [and others

    1997-06-01

    Images taken with streak cameras and gated intensified cameras with both time (longitudinal) and spatial (transverse) resolution reveal a wealth of information about circular accelerators. The authors illustrate a novel technique by a sequence of dual-sweep streak camera images taken at a high dispersion location in the booster synchrotron, where the horizontal coordinate is strongly correlated with the particle energy and the {open_quotes}top-view{close_quotes} of the beam gives a good approximation to the particle density distribution in the longitudinal phase space. A sequence of top-view images taken fight after injection clearly shows the beam dynamics in the phase space. We report another example from the positron accumulator ring for the characterization of its beam compression bunching with the 12th harmonic rf.

  7. Post mastectomy chest wall irradiation using mixed electron-photon beams with or without isocentric technique.

    Science.gov (United States)

    Hamdy, H K; Zikry, M S

    2008-01-01

    To describe our technique in delivering post mastectomy radiotherapy to chest wall using electron-photon mixed beam with or without isocentric application of the tangential photon portals, and to evaluate the associated acute and delayed morbidities. Twenty-two females with invasive breast cancer were subjected to modified radical mastectomy with adequate axillary dissection. All the patients have either tumour > or = 5 cm and/ or positive axillary nodes > 3. Chest wall was irradiated by a mixed beam of 6-Mev electrons (10Gy) and opposed tangential fields using 6 Mev-photons (36 Gy) followed by 6-Mev electrons boost to the scar of mastectomy for 4 Gy/2 fractions. We randomly allocated our patients to receive the photon beam with or without the isocentric technique. The mean dose to the planned target volume (PTV) by mixed beam was 44 Gy (96%) with a mean dose of 42 Gy (91%) to the overlying skin for the whole study group. In cases with right breast disease (17 cases), the mean right lung tissue volume within the PTV was 220 ml (15%). It was relatively higher with the non-iscocentric technique, 281 ml (19%), compared to the isocentric technique of 159 ml (10.5%). In cases with left breast disease (5 cases), the mean left lung volume within the PTV was 175 ml (14%). Larger volume of the lung tissue was included with the non-isocentric technique, 197 ml (16%) compared to the isocentric technique of 153 ml (12%). The mean scattered doses to the rest of the lung tissue, the rest of the heart in left breast cases, and the contra-lateral breast for the whole study group were 2.8 Gy, 1.8 Gy, and 1.4 Gy respectively and was comparable in both treatment arms. None of the cases developed any element of acute radiation related pneumonitis. Delayed radiation induced pneumonitis was seen in 2 cases (18%), with the chest wall treated with radiation with the non-isocentric technique. This study clearly demonstrated the utility of mixed beam in irradiating the chest wall after

  8. DualBeam metrology: a new technique for optimizing 0.13-um photo processes

    Science.gov (United States)

    Berger, Steven D.; Desloge, Denis; Virgalla, Robert J.; Davis, Todd; Paxton, Ted A.; Witko, David

    2001-08-01

    A DualBeam Metrology system was investigated for the application of obtaining 3-dimensional (3D) characterization of a 130 nm ground rule KrF photolithography process. Integrated circuit devices are 3-dimensional in structure and, hence, should be best characterized using 3-dimensional techniques to ensure adherence to the design architecture and the desired process window for manufacturing. The need for 3D metrology is further required for the characterization and monitoring of critical layer processes and equipment performance. The metrology used in this investigation is a novel technique for critical feature cross sectioning. The process for DualBeam metrology uses a focused ion beam (FIB) for milling or cutting the cross section through the photoresist or process film. An integrated scanning electron microscope (SEM) provides high-resolution imaging of the features, and a flexible automated metrology package collects and analyzes the data. To demonstrate the feasibility of the technique, critical dimension (CD) data and sidewall angle (SWA) measurements were captured from 130 nm lines and 150 nm contacts at 1:1 densities. The critical criteria for the characterization of the photolithography process window are CD control, depth of focus (DOF), exposure latitude, and feature sidewall angle or profile. Using the DualBeam technique, 2D and 3D data are captured on a single machine platform using a cut, look, and measure routine. A further benefit is the availability of high-resolution cross-sectional SEM images that can be used qualitatively to validate the quantitative data. The results presented here show the performance of this 130 nm ground rule process and the benefits of utilizing this efficient characterization technique.

  9. SU-E-T-443: Developmental Technique for Proton Pencil Beam Measurements: Depth Dose

    Energy Technology Data Exchange (ETDEWEB)

    Arjomandy, B; Lee, T; Schultz, T; Hsi, W; Park, S [McLaren Cancer Institute, Flint, MI (United States)

    2014-06-01

    Purpose: Measurements of depth dose distribution (DDD) of pencil beam in proton therapy can be challenging and time consuming. We have developed a technique that uses two Bragg peak chambers to expedite these measurements with a high accuracy. Methods and Material: We used a PTW water tank and two PTW 10.5 cm3 Bragg peak chambers; one as a field chamber and the other as a reference chamber to measure DDDs for 100–250 MeV proton pencil beams. The reference chamber was positioned outside of the water tank upstream with respect to field chamber. We used Geant4 Monte Carlo Simulation (MCS) to model the ProTom proton beam to generate DDDs. The MCS generated DDDs were used to account for halo effects of proton pencil beam that are not measureable with Bragg peak chambers. We also used PTW PEAKFINDER to measure DDDs for comparison purpose. Results: We compared measured and MCS DDDs with Continuous Slowing Down Approximation (CSDA) ranges to verify the range of proton beams that were supplied by the manufacturer. The agreements between all DDD with respect to CSDA were within ±0.5 mm. The WET for Bragg peak chamber for energies between 100–250 MeV was 12.7 ± 0.5 mm. The correction for halo effect was negligible below 150 MeV and was in order of ∼5-10% for 150–250 MeV. Conclusion: Use of Bragg Peak chamber as a reference chamber can facilitate DDD measurements in proton pencil beam with a high accuracy. Some corrections will be required to account for halo effect in case of high energy proton beams due to physical size of chamber.

  10. Cu2ZnSnS4 thin films prepared by sulfurization of ion beam sputtered precursor and their electrical and optical properties

    Institute of Scientific and Technical Information of China (English)

    ZHANG Jun; SHAO Lexi; FU Yujun; XIE Erqing

    2006-01-01

    Cu2ZnSnS4 (CZTS) thin films were successfully prepared by sulfurization of ion bean sputtered precursors on soda-lime glass substrate. The single phase of stannite-type structure CZTS films were obtained as revealed in EDS and XRD analysis when the ratios of the constituents of CZTS thin films are close to stoichiometric by optimizing the conditions of precursor preparation and sulfurization. A low sheet resistivity as about 0.156 Ω·cm and a high absorption coefficient as 1×104 cm-1 were achieved in this method by Hall effect measurements and UV-VIS spectrophotometer. The optical band-gap energy of the CZTS sample is about 1.51 eV, which is very close to the optimum value for a solar-cell absorber.

  11. Nuclear physics experiments with in-beam fast-timing and plunger techniques

    Science.gov (United States)

    Sotty, C.

    2017-06-01

    Nuclear lifetime and g factor are crucial observables in nuclear physics, as they give access to the excited states nuclear wave functions using the well-known electromagnetic transition operators. Thus, they are benchmarks to validate or discard nuclear structure theories. During the last decades, the evolution of the nuclear instruments and methods gave birth to several techniques used to measure lifetimes and moments. Among them, the in-beam Fast Electronic Scintillation Timing (FEST) technique is used to measure lifetimes of nuclear states in the picosecond to nanosecond range. Plunger devices originally developed to perform lifetime measurements of excited states in the picosecond range using the Recoil Distance Doppler Shift (RDDS) are now also employed to measure g factor using the new Time-Differential Recoil-In-Vacuum (TDRIV) technique. Recently commissioned, the ROmanian array for SPectroscopy in HEavy ion REactions (ROSPHERE) is dedicated to perform γ-ray spectroscopy, specially suited for lifetime measurements using the RDDS and in-beam fast-timing techniques at the 9 MV Bucharest-Tandem accelerator facility of the Horia Hulubei National Institute of Physics and Nuclear Engineering (IFIN-HH). An introduction of above-mentioned techniques is provided and selected results are illustrating them with physics cases. The in-beam fast-timing and RDDS techniques are described using lifetime measurements respectively in 67Cu and 120Te measured at the 9 MV Bucharest-Tandem accelerator. Finally, the precise g factor measurement of the first-excited state in 24Mg using by the new TDRIV technique at the ALTO-Tandem Orsay facility is presented.

  12. A Review: Welding Of Dissimilar Metal Alloys by Laser Beam Welding & Friction Stir Welding Techniques

    Directory of Open Access Journals (Sweden)

    Ms. Deepika Harwani

    2014-12-01

    Full Text Available Welding of dissimilar metals has attracted attention of the researchers worldwide, owing to its many advantages and challenges. There is no denial in the fact that dissimilar welded joints offer more flexibility in the design and production of the commercial and industrial components. Many welding techniques have been analyzed to join dissimilar metal combinations. The objective of this paper is to review two such techniques – Laser welding and Friction stir welding. Laser beam welding, a high power density and low energy-input process, employs a laser beam to produce welds of dissimilar materials. Friction stir welding, a solid-state joining process, is also successfully used in dissimilar welding applications like aerospace and ship building industries. This paper summarizes the trends and advances of these two welding processes in the field of dissimilar welding. Future aspects of the study are also discussed.

  13. The kick-out mass selection technique for ions stored in an Electrostatic Ion Beam Trap

    Energy Technology Data Exchange (ETDEWEB)

    Toker, Y; Altstein, N; Aviv, O; Rappaport, M L; Heber, O; Schwalm, D; Strasser, D; Zajfman, D [Department of Particle Physics, Weizmann Institute of Science, Rehovot, 76100 (Israel)], E-mail: jtoker@weizmann.ac.il

    2009-09-15

    A simple mass selection technique which allows one to clean a keV ion beam of undesirable masses while stored in an Electrostatic Ion Beam Trap (EIBT) is described. The technique is based on the time-of-flight principle and takes advantage of the long storage times and self-bunching that are possible in this type of traps (self bunching being the effect that keeps ions of the same mass bunched in spite of their finite distributions of velocities and trajectories). As the oscillation period is proportional to the square root of the ion mass, bunches containing ions of different masses will separate in space with increasing storage time and can be kicked out by a pulsed deflector mounted inside the trap. A mass selector of this type has been implemented successfully in an EIBT connected to an Even-Lavie supersonic expansion source and is routinely used in ongoing cluster experiments.

  14. Ionized magnetron sputtering of aluminum(,2)oxygen(,3)

    Science.gov (United States)

    Gonzalez, Patrick Fernando

    2000-10-01

    This dissertation shows a detailed study of the conditions necessary for sputtering alumina using a novel variant of ionized magnetron sputtering (IMS) first demonstrated by Yamashita et. al. The study presented herein leverages concurrent research at our laboratory on high density plasmas, plasma characterization and charged particle beams research to demonstrate a new source capable of sputtering hydrated alumina films at high rates. High quality ceramics such as Al2O3 find uses in a variety of applications, and in particular, for mass storage applications. Consequently, there exists an ever-growing need to provide and improve the capability of growing thick insulating films. Ideally, the insulating film should be stoichiometric and able to be grown at rates high enough to be easily manufacturable. Alumina is a particularly attractive due to its high density, Na barrier properties, and stability and radiation resistance. However, high quality films are often difficult to achieve with conventional RF plasma due to extremely slow deposition rates and difficulties associated with system cooling. The preferred method is to reactively sputter Al from a solid target in an O2 ambient. Nevertheless, this process is inherently unstable and leads to arcing and uneven target wear when magnetrons are used. In this study, we build the sputtering source, evaluate, and maximize the deposition characteristics of alumina films sputtered from a solid target in an Ar/O2 ambient. Semi-crystalline (kappa + theta) alumina has been reported using a similar technique at temperatures as low 370 C. The difference in the system used herein is that RF power is used for both, the inductive and capacitive components. Additionally, we use a solid target made of sintered alumina throughout the experiment. A model is developed using regression analysis and compared to results obtained. Because plasma parameters can interact with each other, we explore ICP/CCP power interactions and gas influence

  15. Damage Detection Technique for Cold-Formed Steel Beam Structure Based on NSGA-II

    Directory of Open Access Journals (Sweden)

    Byung Kwan Oh

    2015-01-01

    Full Text Available Cold-formed steel is uniform in quality, suitable for mass production, and light in weight. It is widely used for both structural and nonstructural members in buildings. When it is used in a bending structural member, damage such as local buckling is considered to be more important than general steel members in terms of failure mode. However, preceding studies on damage detection did not consider the failure characteristics of cold-formed beam members. Hence, this paper proposes a damage detection technique that considers the failure mode of local buckling for a cold-formed beam member. The differences between the dynamic characteristics from vibration-based measurements and those from finite element model are set to error functions. The error functions are minimized by the optimization technique NSGA-II. In the damage detection, the location of local damage and the severity of damage are considered variables. The proposed technique was validated through a simulation of damage detection for a cold-formed steel beam structure example.

  16. Solar system sputtering

    Science.gov (United States)

    Tombrello, T. A.

    1982-01-01

    The sites and materials involved in solar system sputtering of planetary surfaces are reviewed, together with existing models for the processes of sputtering. Attention is given to the interaction of the solar wind with planetary atmospheres in terms of the role played by the solar wind in affecting the He-4 budget in the Venus atmosphere, and the erosion and differentiation of the Mars atmosphere by solar wind sputtering. The study is extended to the production of isotopic fractionation and anomalies in interplanetary grains by irradiation, and to erosion effects on planetary satellites with frozen volatile surfaces, such as with Io, Europa, and Ganymede. Further measurements are recommended of the molecular form of the ejected material, the yields and energy spectra of the sputtered products, the iosotopic fractionation sputtering causes, and the possibility of electronic sputtering enhancement with materials such as silicates.

  17. Overview of Alternative Bunching and Current-shaping Techniques for Low-Energy Electron Beams

    Energy Technology Data Exchange (ETDEWEB)

    Piot, Philippe [Northern Illinois U.

    2015-12-01

    Techniques to bunch or shape an electron beam at low energies (E <15 MeV) have important implications toward the realization of table-top radiation sources [1] or to the design of compact multi-user free-electron lasers[2]. This paper provides an overview of alternative methods recently developed including techniques such as wakefield-based bunching, space-charge-driven microbunching via wave-breaking [3], ab-initio shaping of the electron-emission process [4], and phase space exchangers. Practical applications of some of these methods to foreseen free-electron-laser configurations are also briefly discussed [5].

  18. The Study of New Signal Processing Technique in Photon Beam Position Monitors

    CERN Document Server

    Lin, Shunfu; Lu, Ping; Sun Bao Gen; Wang, Jigang

    2005-01-01

    A log-ratio signal processing technique in photon beam position monitors (PBPM) was presented in this paper. The main performances (e.g. sensitivity, position offset and linearity range) of split PBPM and a pair of wires PBPM were analyzed , and the result of the measurement fit well with the theory. An inexpensive logarithmic amplifier chip which can measure photon currents from 0.1nA to 3.5mA was used in electronic circuits. The logarithmic ratio of the signal amplitudes from the PBPM provides a real-time analog signal that has wider linearity range and higher bandwidth than signal processing technique.

  19. A novel electron beam evaporation technique for the deposition of superconducting thin films

    Science.gov (United States)

    Krishna, M. G.; Muralidhar, G. K.; Rao, K. N.; Rao, G. M.; Mohan, S.

    1991-05-01

    Superconducting thin films of BiSrCaCuO have been deposited using a novel electron beam evaporation technique. In this technique the crucible has a groove around its circumference and rotates continuously during deposition. The source material is loaded in the form of pellets of the composite. Both oxides as well as flourides have been used in the starting material and a comparison of the film properties has been made. The best film was obtained on a MgO(100) substrate with a Tc onset at 85 K and Tc zero at 77 K using calcium flouride in the source material.

  20. Reducing beam shaper alignment complexity: diagnostic techniques for alignment and tuning

    Science.gov (United States)

    Lizotte, Todd E.

    2011-10-01

    Safe and efficient optical alignment is a critical requirement for industrial laser systems used in a high volume manufacturing environment. Of specific interest is the development of techniques to align beam shaping optics within a beam line; having the ability to instantly verify by a qualitative means that each element is in its proper position as the beam shaper module is being aligned. There is a need to reduce these types of alignment techniques down to a level where even a newbie to optical alignment will be able to complete the task. Couple this alignment need with the fact that most laser system manufacturers ship their products worldwide and the introduction of a new set of variables including cultural and language barriers, makes this a top priority for manufacturers. Tools and methodologies for alignment of complex optical systems need to be able to cross these barriers to ensure the highest degree of up time and reduce the cost of maintenance on the production floor. Customers worldwide, who purchase production laser equipment, understand that the majority of costs to a manufacturing facility is spent on system maintenance and is typically the largest single controllable expenditure in a production plant. This desire to reduce costs is driving the trend these days towards predictive and proactive, not reactive maintenance of laser based optical beam delivery systems [10]. With proper diagnostic tools, laser system developers can develop proactive approaches to reduce system down time, safe guard operational performance and reduce premature or catastrophic optics failures. Obviously analytical data will provide quantifiable performance standards which are more precise than qualitative standards, but each have a role in determining overall optical system performance [10]. This paper will discuss the use of film and fluorescent mirror devices as diagnostic tools for beam shaper module alignment off line or in-situ. The paper will also provide an overview

  1. Dual beam light profile microscopy: a new technique for optical absorption depth profilometry.

    Science.gov (United States)

    Power, J F; Fu, S W

    2004-02-01

    Light profile microscopy (LPM) is a recently developed technique of optical inspection that is used to record micrometer-scale images of thin-film cross-sections on a direct basis. In single beam mode, LPM provides image contrast based on luminescence, elastic, and/or inelastic scatter. However, LPM may also be used to depth profile the optical absorption coefficient of a thin film based on a method of dual beam irradiation presented in this work. The method uses a pair of collimated laser beams to consecutively irradiate a film from two opposing directions along the depth axis. An average profile of the beam's light intensity variation through the material is recovered for each direction and used to compute a depth-dependent differential absorbance profile. This latter quantity is shown from theory to be related to the film's depth-dependent optical absorption coefficient through a simple linear model that may be inverted by standard methods of numerical linear algebra. The inverse problem is relatively well posed, showing good immunity to data errors. This profilometry method is experimentally applied to a set of well-characterized materials with known absorption properties over a scale of tens of micrometers, and the reconstructed absorption profiles were found to be highly consistent with the reference data.

  2. Beam profile measurement on HITU transducers using a thermal intensity sensor technique

    Science.gov (United States)

    Wilkens, V.; Sonntag, S.; Jenderka, K.-V.

    2011-02-01

    Thermal intensity sensors based on the transformation of the incident ultrasonic energy into heat inside a small cylindrical absorber have been developed at PTB in the past, in particular to determine the acoustic output of medical diagnostic ultrasound equipment. Currently, this sensor technique is being expanded to match the measurement challenges of high intensity therapeutic ultrasound (HITU) fields. At the high acoustic power levels as utilized in the clinical application of HITU transducers, beam characterization using hydrophones is critical due to the possible damage of the sensitive and expensive measurement devices. Therefore, the low-cost and robust thermal sensors developed offer a promising alternative for the determination of high intensity output beam profiles. A sensor prototype with a spatial resolution of 0.5 mm was applied to the beam characterization of an HITU transducer operated at several driving amplitude levels. Axial beam plots and lateral profiles at focus were acquired. The absolute continuous wave output power was, in addition, determined using a radiation force balance.

  3. A comprehensive EPID-based 3D validation technique for TrueBeam-delivered VMAT plans

    Science.gov (United States)

    Ansbacher, W.; Gagne, I. M.; Swift, C.-L.

    2014-03-01

    Purpose: To develop and validate a pre-treatment EPI dosimetry method on Varian TrueBeam linacs using continuous imaging, with reconstruction in a 3D cylindrical phantom geometry. Methods: Delivery of VMAT plans with continuous imaging is currently possible only in Research Mode on TrueBeam linacs, with images acquired in a proprietary format. An earlier technique was adapted to take advantage of technical improvements in EPID delivery, and was tested under various acquisition conditions. The dosimetry of VMAT plans was evaluated at isocentre and within patient volumes that had been transferred to the virtual phantom. Results: Approximately 60 portal image projections per arc were found to be adequate for 3D reconstruction in phantom volumes of 28cm diameter. Twelve prostate, CNS and Head & Neck deliveries were evaluated in Research mode relative to the corresponding Eclipse (v.10) treatment plans, and to measurements on an ArcCheck device in Treatment mode. Mean dose differences at isocentre were within 2% for the three-way comparison, and in PTV volumes were within 1% (s.d. 1%). However, some discrepancies were observed in ArcCheck results that may be related to the small dimensions of certain VMAT apertures. Conclusions: EPI dosimetry with 3D dose reconstruction is an accurate, comprehensive and efficient pre-treatment validation technique for VMAT delivery. Although currently limited to a research mode on TrueBeam, it has the potential to be implemented for clinical use.

  4. Denton Vacuum Discovery-550 Sputterer

    Data.gov (United States)

    Federal Laboratory Consortium — Description: CORAL Name: Sputter 2 Similar to the existing 4-Gun Denton Discovery 22 Sputter system, with the following enhancements: Specifications / Capabilities:...

  5. A Layer Correlation Technique for ATLAS Calorimetry Calibration at the 2004 ATLAS Combined Beam Test

    CERN Document Server

    Carli, T; Spanò, F; Speckmayer, P

    2008-01-01

    A method for calibrating the response of a segmented calorimeter to hadrons is developed. The ansatz is that information on longitudinal shower fluctuations gained from a principal component analysis of the layer energy depositions can improve energy resolution by correcting for hadronic invisible energy and dead material losses: projections along the eigenvectors of the correlation matrix are used as input for the calibration. The technique is used to reconstruct the energy of pions impinging on the ATLAS calorimeters during the 2004 Barrel Combined Beam Test at the CERN H8 area. Simulated Monte Carlo events are used to derive corrections for invisible energy lost in nuclear reactions and in dead material in front and in between the calorimeters. For pion beams with energies between 20 and 180 GeV, the particle energy is reconstructed within 3% and the resolution is improved by about 20%.

  6. An improved optical flow tracking technique for real-time MR-guided beam therapies in moving organs

    NARCIS (Netherlands)

    Zachiu, C.; Papadakis, N.; Ries, M.; Moonen, C.; de Senneville, B. Denis

    2015-01-01

    Magnetic resonance (MR) guided high intensity focused ultrasound and external beam radiotherapy interventions, which we shall refer to as beam therapies/interventions, are promising techniques for the non-invasive ablation of tumours in abdominal organs. However, therapeutic energy delivery in these

  7. Implementation of ion-beam techniques in microsystems manufacturing: opportunities in cell biology

    Science.gov (United States)

    Campo, E. M.; Lopez-Martinez, M. J.; Fernández, E.; Esteve, J..; Plaza, J. A.

    2009-05-01

    Micromachining techniques are proposed to mass-manufacture innovative silicon oxide micropipettes and conventional boron-silicate pipettes with highly customized tips to address increasingly demanding cell handling procedures. Cell handling has become a crucial procedure in cell biology, especially in nuclear transfer, DNA injection, and in assisted reproductive techniques. Most pipette manufacturing procedures involve tedious artisanal methods prone to failure and with limited functionality. We expect high tip customization to have a large impact in current and future cell manipulation, paving the way for augmented functionality. Although proper biocompatibility assessments remain to be explored, initial pierced embryos are seen to continue their division procedure up to at least 24 hours. The continued cellular division is a good sign of biocompatibility. These results suggest that residual chemical agents or gallium ions injected during milling could be harmless to life development. We conclude that we have produced a novel technique combining microfabrication and Focus Ion Beam processes with great potential for industrial applications.

  8. Study of laser-induced plasma shock waves by the probe beam deflection technique

    Institute of Scientific and Technical Information of China (English)

    Yan Qian; Jian Lu; Xiaowu Ni

    2009-01-01

    Laser probe beam deflection technique is used for the analysis of laser-induced plasma shock waves in air and distilled water.The temporal and spatial variations of the parameters on shock fronts are studied as funotions of focal lens position and laser energy.The influences of the characteristics of media are investigated on the well-designed experimental setup.It is found that the shock wave in distilled water attenuates to an acoustic wave faster than in air under the same laser energy.Good agreement is obtained between our experimental results and those attained with other techniques.This technique is versatile,economic,and simple to implement,being a pronmising diagnostic tool for pulsed laser processing.

  9. Pre-stressed anchoring beam technique applicable in the reinforcement of high-steep slopes

    Institute of Scientific and Technical Information of China (English)

    Zhifa YANG; Luqing ZHANG; Jiewang ZHU

    2006-01-01

    During the construction of some large-scale rock engineering, high-steep slopes and insufficient slope stability induced by unloading fissures are often encountered. For the reinforcement of these slopes, some techniques (including conventional pre-stressed anchoring cable and unconventional anchoring hole) are usually utilized, however, having several obvious defects. Thus, it is very difficult for a designer to design an efficient reinforcement scheme for the high-steep slopes. For this reason, the authors develop the pre-stressed anchoring beam technique, in which tensile capacity of pre-stressed structures are fully utilized. It is analyzed that the new technique is characterized by multi-functions, including engineering investigation, efficient reinforcement, drainage, monitoring and urgent strength supplement, and hoped to be extensively applicable in the reinforcement of high-steep slopes.

  10. Sputtering of water ice

    DEFF Research Database (Denmark)

    Baragiola, R.A.; Vidal, R.A.; Svendsen, W.

    2003-01-01

    We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from...

  11. Secondary growth mechanism of SiGe islands deposited on a mixed-phase microcrystalline Si by ion beam co-sputtering.

    Science.gov (United States)

    Ke, S Y; Yang, J; Qiu, F; Wang, Z Q; Wang, C; Yang, Y

    2015-11-01

    We discuss the SiGe island co-sputtering deposition on a microcrystalline silicon (μc-Si) buffer layer and the secondary island growth based on this pre-SiGe island layer. The growth phenomenon of SiGe islands on crystalline silicon (c-Si) is also investigated for comparison. The pre-SiGe layer grown on μc-Si exhibits a mixed-phase structure, including SiGe islands and amorphous SiGe (a-SiGe) alloy, while the layer deposited on c-Si shows a single-phase island structure. The preferential growth and Ostwald ripening growth are shown to be the secondary growth mechanism of SiGe islands on μc-Si and c-Si, respectively. This difference may result from the effect of amorphous phase Si (AP-Si) in μc-Si on the island growth. In addition, the Si-Ge intermixing behavior of the secondary-grown islands on μc-Si is interpreted by constructing the model of lateral atomic migration, while this behavior on c-Si is ascribed to traditional uphill atomic diffusion. It is found that the aspect ratios of the preferential-grown super islands are higher than those of the Ostwald-ripening ones. The lower lateral growth rate of super islands due to the lower surface energy of AP-Si on the μc-Si buffer layer for the non-wetting of Ge at 700 °C and the stronger Si-Ge intermixing effect at 730 °C may be responsible for this aspect ratio difference.

  12. Substrate induced magnetostrictive anisotropy in heat treated ion-beam sputtered TbDyFe(+Zr) single and TbDyFe+Zr/Nb multilayers

    Energy Technology Data Exchange (ETDEWEB)

    Fischer, S.F.; Faber, P.; Kronmueller, H. [Max-Planck-Institut fuer Metallforschung, Stuttgart (Germany)

    1998-07-01

    The effect of anisotropic thermal expansion of (1 anti 100)-oriented sapphire substrates has been investigated with respect to magnetostrictive anisotropy in sputter deposited (Tb{sub 0.27}Dy{sub 0.73}){sub 1-x}Fe{sub x} single layers and [(Tb{sub 0.27}Dy{sub 0.73}){sub 0.27}Fe{sub 0.73} + 2 at% Zr]/Nb multilayers. It is found that the thermally induced anisotropic film stress due to the anisotropic thermal expansion of sapphire can result in a magnetostrictive inplane transversal anisotropy. This may be of major interest for giant magnetostrictive thin film applications in microsystems where reversible magnetomechanical switching elements are required. Magnetic, magnetostrictive and microstructural (XRD) experiments have been performed. Magnetostriction has been measured at room temperature using the cantilever method with maximum inplane applied fields of 0.8 T. Ratios {lambda} {sub parallel} /{lambda} {sub perpendicular} {sub to} of magnetostrictions in fields applied parallel and transversal to the cantilever's longside ([0001]-substrate direction) are taken as a measure of the magnetostrictive inplane anisotropy. We found that {lambda} {sub parallel} /{lambda} {sub perpendicular} {sub to} (0.8 T) is varying with the microstructure (average grain sizes d) resulting from different heat treament. It is assumed that within the competition of magnetoelastic (favouring an inplane transversal anistropy) and magnetocrystalline interactions (favouring an inplane isotropy) the second will dominate for larger average grain sizes. This is indicated by comparison of nanocrystalline films on sapphire with different grain sizes d: amorphous or nanocrystalline (d < 25 nm) films exhibit a transversal magnetostrictive anisotropy ({lambda} {sub parallel} /{lambda} {sub perpendicular} {sub to} (0.8 T) >> 2) while stable crystalline films show magnetostrictive inplane isotropy ({lambda} {sub parallel} /{lambda} {sub perpendicular} {sub to} (0.8 T) {proportional_to} 1). (orig.)

  13. New technique of skin embedded wire double-sided laser beam welding

    Science.gov (United States)

    Han, Bing; Tao, Wang; Chen, Yanbin

    2017-06-01

    In the aircraft industry, double-sided laser beam welding is an approved method for producing skin-stringer T-joints on aircraft fuselage panels. As for the welding of new generation aluminum-lithium alloys, however, this technique is limited because of high hot cracking susceptibility and strengthening elements' uneven distributions within weld. In the present study, a new technique of skin embedded wire double-sided laser beam welding (LBW) has been developed to fabricate T-joints consisting of 2.0 mm thick 2060-T8/2099-T83 aluminum-lithium alloys using eutectic alloy AA4047 filler wire. Necessary dimension parameters of the novel groove were reasonably designed for achieving crack-free welds. Comparisons were made between the new technique welded T-joint and conventional T-joint mainly on microstructure, hot crack, elements distribution features and mechanical properties within weld. Excellent crack-free microstructure, uniform distribution of silicon and superior tensile properties within weld were found in the new skin embedded wire double-sided LBW T-joints.

  14. Optical properties of AlGaN nanowires synthesized via ion beam techniques

    Science.gov (United States)

    Parida, Santanu; Magudapathy, P.; Sivadasan, A. K.; Pandian, Ramanathaswamy; Dhara, Sandip

    2017-05-01

    AlGaN plays a vital role in hetero-structure high electron mobility transistors by employing a two-dimensional electron gas as an electron blocking layer in multi-quantum well light emitting diodes. Nevertheless, the incorporation of Al into GaN for the formation of the AlGaN alloy is limited by the diffusion barrier formed by instant nitridation of Al adatoms by reactive atomic N. The incorporation of Al above the miscibility limit, however, can be achieved by the ion beam technique. The well known ion beam mixing (IBM) technique was carried out with the help of Ar+ irradiation for different fluences. A novel approach was also adopted for the synthesis of AlGaN by the process of post-irradiation diffusion (PID) as a comparative study with the IBM technique. The optical investigations of AlGaN nanowires, synthesized via two different methods of ion beam processing, are reported. The effect of irradiation fluence and post-irradiation annealing temperature on the random alloy formation was studied by the vibrational and photoluminescence (PL) spectroscopic studies. Vibrational studies show one-mode phonon behavior corresponding to the longitudinal optical (LO) mode of A1 symmetry [A1(LO)] for the wurtzite phase of AlGaN nanowires in the random alloy model. A maximum Al atomic percentage of ˜6.3%-6.7% was calculated with the help of band bowing formalism from the Raman spectral analysis for samples synthesized in IBM and PID processes. PL studies show the extent of defects present in these samples.

  15. Analysis of telescopic beam structure using couple of DOF technique and its application

    Institute of Scientific and Technical Information of China (English)

    GUO Feng; ZHAO Wei-min; LI Gui-xian

    2009-01-01

    Couple of DOF technique in FEM and the algorithm for equation group solution in the whole stiffness matrix is studied in this paper. A new procedure is developed for the analysis of telescope beam structure. This method can solve most of the complex structural problems in engineering practice. This method has been used in the FEM analysis of pile frame of multifunction drilling machine, which is designed and manufactured by our research group. The right analysis result can improves the design efficiency and the reliability of the structure and reduce the design cost.

  16. Monte Carlo simulations of ripple filters designed for proton and carbon ion beams in hadrontherapy with active scanning technique

    Energy Technology Data Exchange (ETDEWEB)

    Bourhaleb, F; Givehchi, N; Iliescu, S; Rosa, A La; Pecka, A; Peroni, C [Dipartimento di Fisica Sperimentale, Universita' di Torino, Via P. Giuria 1, Torino 10125 (Italy); Attili, A; Cirio, R; Marchetto, F; Donetti, M; Garella, M A; Giordanengo, S; Pardo, J [INFN, Sezione di Torino, Via P. Giuria 1, Torino 10125 (Italy); Cirrone, P [INFN, Laboratori Nazionali del Sud, Via S.Sofia 62, Catania 95125 (Italy)], E-mail: bourhaleb@to.infn.it

    2008-02-01

    Proton and carbon ion beams have a very sharp Bragg peak. For proton beams of energies smaller than 100 MeV, fitting with a gaussian the region of the maximum of the Bragg peak, the sigma along the beam direction is smaller than 1 mm, while for carbon ion beams, the sigma derived with the same technique is smaller than 1 mm for energies up to 360 MeV. In order to use low energy proton and carbon ion beams in hadrontherapy and to achieve an acceptable homogeneity of the spread out Bragg peak (SOBP) either the peak positions along the beam have to be quite close to each other or the longitudinal peak shape needs to be broaden at least few millimeters by means of a properly designed ripple filter. With a synchrotron accelerator in conjunction with active scanning techniques the use of a ripple filter is necessary to reduce the numbers of energy switches necessary to obtain a smooth SOBP, leading also to shorter overall irradiation times. We studied the impact of the design of the ripple filter on the dose uniformity in the SOBP region by means of Monte Carlo simulations, implemented using the package Geant4. We simulated the beam delivery line supporting both proton and carbon ion beams using different energies of the beams. We compared the effect of different kind of ripple filters and their advantages.

  17. Optical phase distortion due to turbulent-fluid density fields - Quantification using the small-aperture beam technique

    Science.gov (United States)

    Jumper, E. J.; Hugo, R. J.

    1992-07-01

    This paper discusses the small-aperture beam technique, a relatively new way of experimentally quantifying optically-active, turbulent-fluid-flow-induced optical degradation. The paper lays out the theoretical basis for the technique, and the relationship of the measured jitter of the beam to optical path difference. A numerical simulation of a two-dimensional heated jet is used to explore the validity of beam jitter to obtain optical path difference in a flow region where eddy production constitutes the major character of the 'turbulent' flow field.

  18. PREFACE: 13th International Workshop on Slow Positron Beam Techniques and Applications (SLOPOS13)

    Science.gov (United States)

    2014-04-01

    These proceedings originate from the 13th International Workshop on Slow Positron Beam Techniques and Applications SLOPOS13 which was held at the campus of the Technische Universität München in Garching between 15th-20th September, 2013. This event is part of a series of triennial SLOPOS conferences. In total 123 delegates from 21 countries participated in the SLOPOS13. The excellent scientific program comprised 50 talks and 58 posters presented during two poster sessions. It was very impressive to learn about novel technical developments on positron beam facilities and the wide range of their applications all over the world. The workshop reflected the large variety of positron beam experiments covering fundamental studies, e.g., for efficient production of anti-hydrogen as well as applied research on defects in bulk materials, thin films, surfaces, and interfaces. The topics comprised: . Positron transport and beam technology . Pulsed beams and positron traps . Defect profiling in bulk and layered structures . Nanostructures, porous materials, thin films . Surfaces and interfaces . Positronium formation and emission . Positron interactions with atoms and molecules . Many positrons and anti-hydrogen . Novel experimental techniques The international advisory committee of SLOPOS awarded student prizes for the best presented scientific contributions to a team of students from Finland, France, and the NEPOMUC team at TUM. The conference was overshadowed by the sudden death of Professor Klaus Schreckenbach immediately before the workshop. In commemoration of him as a spiritus rectus of the neutron induced positron source a minutes' silence was hold. We are most grateful for the hard work of the Local Organising Committee, the help of the International Advisory Committee, and all the students for their friendly and efficient support during the meeting. The workshop could not have occurred without the generous support of the Heinz Maier-Leibnitz Zentrum (MLZ), Deutsche

  19. Hollow metal target magnetron sputter type radio frequency ion source

    Energy Technology Data Exchange (ETDEWEB)

    Yamada, N., E-mail: mwada@mail.doshisha.ac.jp; Kasuya, T.; Wada, M. [Graduate School of Science and Engineering, Doshisha University, Kyoto 610–0321 (Japan); Tsubouchi, N. [Kansai Institute, Advanced Industrial Science and Technology, Osaka 563–8577 (Japan)

    2014-02-15

    A 70 mm diameter 70 mm long compact ion source equipped with a hollow sputtering target has been designed and tested. The hollow sputtering target serves as the radio frequency (RF) plasma excitation electrode at 13.56 MHz. A stable beam of Cu{sup +} has been extracted when Ar was used as the discharge support gas. In the extracted beam, Cu{sup +} had occupied more than 85% of the total ion current. Further increase in Cu{sup +} ions in the beam is anticipated by increasing the RF power and Ar pressure.

  20. All-optical optoacoustic microscopy system based on probe beam deflection technique

    Science.gov (United States)

    Maswadi, Saher M.; Tsyboulskic, Dmitri; Roth, Caleb C.; Glickman, Randolph D.; Beier, Hope T.; Oraevsky, Alexander A.; Ibey, Bennett L.

    2016-03-01

    It is difficult to achieve sub-micron resolution in backward mode OA microscopy using conventional piezoelectric detectors, because of wavefront distortions caused by components placed in the optical path, between the sample and the objective lens, that are required to separate the acoustic wave from the optical beam. As an alternate approach, an optoacoustic microscope (OAM) was constructed using the probe beam deflection technique (PBDT) to detect laserinduced acoustic signals. The all-optical OAM detects laser-generated pressure waves using a probe beam passing through a coupling medium, such as water, filling the space between the microscope objective lens and sample. The acoustic waves generated in the sample propagate through the coupling medium, causing transient changes in the refractive index that deflect the probe beam. These deflections are measured with a high-speed, balanced photodiode position detector. The deflection amplitude is directly proportional to the magnitude of the acoustic pressure wave, and provides the data required for image reconstruction. The sensitivity of the PBDT detector expressed as noise equivalent pressure was 12 Pa, comparable to that of existing high-performance ultrasound detectors. Because of the unimpeded working distance, a high numerical aperture objective lens, i.e. NA = 1, was employed in the OAM to achieve near diffraction-limited lateral resolution of 0.5 μm at 532nm. The all-optical OAM provides several benefits over current piezoelectric detector-based systems, such as increased lateral and axial resolution, higher sensitivity, robustness, and potentially more compatibility with multimodal instruments.

  1. Characterization of hydrogenated and deuterated silicon carbide films codeposited by magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Pantelica, D., E-mail: pantel@ifin.nipne.ro [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, RO-077125, 30 Reactorului St., Magurele (Romania); Ionescu, P.; Petrascu, H. [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, RO-077125, 30 Reactorului St., Magurele (Romania); Dracea, M.D. [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, RO-077125, 30 Reactorului St., Magurele (Romania); Faculty of Physics, University of Bucharest, 405 Atomistilor Str., RO-077125, P.O.B. MG-11, Magurele-Bucharest (Romania); Statescu, M. [Horia Hulubei National Institute for Physics and Nuclear Engineering (IFIN-HH), P.O.B. MG-6, RO-077125, 30 Reactorului St., Magurele (Romania); Matei, E.; Rasoga, O. [National Institute of Materials Physics, RO-077125, 105 bis Atomistilor Str., Magurele-Bucharest (Romania); Stancu, C. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania); Marascu, V. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania); Faculty of Physics, University of Bucharest, 405 Atomistilor Str., RO-077125, P.O.B. MG-11, Magurele-Bucharest (Romania); Ion, V. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania); Acsente, T., E-mail: tomy@infim.ro [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania); Dinescu, G. [National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Str., RO-077125 Magurele-Bucharest (Romania)

    2016-03-15

    In this work we present the deposition of amorphous SiC thin films by radiofrequency dual magnetron sputtering. The dependence of the deposited films properties over the discharges electrical power and the effect of hydrogenous species (H{sub 2} and/or D{sub 2}) addition to main discharge gas (Ar) were investigated. Accurate elemental analysis of the samples, including detection of hydrogen and deuterium, was performed by ion beam analysis (IBA) techniques: RBS (Rutherford Backscattering Spectrometry) and ERDA (Elastic Recoil Detection Analysis). SiC{sub x} thin films with thicknesses between 1700 and 4500 Å and C/Si ratio between 0.2/1 and 1.25/1 were obtained in different deposition conditions. The results prove that thin films of amorphous SiC with well controlled properties can be produced using radiofrequency dual magnetron sputtering.

  2. Conductive conformal thin film coatings for textured PV: ALD versus sputtering

    Science.gov (United States)

    Dameron, Arrelaine; Christensen, Steven; Galante, Marie; Berry, Joseph; Gillaspie, Dane; Perkins, John; Ginley, David; Gennett, Thomas

    2011-09-01

    Next-generation photovoltaic structures require well-established deposition routes to conformal and conducting materials with defined chemical, physical and electronic composition. This work reports on the preliminary findings associated with conformal metal oxides on structured substrates including: 1) Discovery of sputtering process conditions that can be made semi-conformal when combined with in-situ techniques such as ion-beam milling for honing surface structures; 2) Development of relevant ALD chemistries that are materials-properties competitive with sputtered materials; 3) Evaluation of chemically-functionalized surface structures that maximize surface area but are structurally tailored for efficient gas flow and to minimize line-of-sight shadowing. The initial experiments have centered on combinations of amorphous and crystalline indium oxide, zinc oxide, aluminum zinc oxide, indium tin oxide, fluorinated tin oxide and indium zinc oxide. This presentation will describe these initial experiments and elucidate key physiochemical nature of the deposited thin films.

  3. Analysis and modification of blue sapphires from Rwanda by ion beam techniques

    Energy Technology Data Exchange (ETDEWEB)

    Bootkul, D., E-mail: mo_duangkhae@hotmail.com [Department of General Science - Gems & Jewelry, Faculty of Science, Srinakharinwirot University, Bangkok 10110 (Thailand); Chaiwai, C.; Tippawan, U. [Plasma and Beam Physics Research Facility, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200 (Thailand); Wanthanachaisaeng, B. [Gems Enhancement Research Unit, Faculty of Gems, Burapha University, Chanthaburi Campus, Chanthaburi 22170 (Thailand); Intarasiri, S., E-mail: saweat@gmail.com [Science and Technology Research Institute, Chiang Mai University, Chiang Mai 50200 (Thailand)

    2015-12-15

    Highlights: • Ion beam analysis is an effective method for detecting trace elements. • Ion beam treatment is able to improve optical and color appearances of the blue sapphire from Rwanda. • These alternative methods can be extended to jewelry industry for large scale application. - Abstract: Blue sapphire is categorised in a corundum (Al{sub 2}O{sub 3}) group. The gems of this group are always amazed by their beauties and thus having high value. In this study, blue sapphires from Rwanda, recently came to Thai gemstone industry, are chosen for investigations. On one hand, we have applied Particle Induced X-ray Emission (PIXE), which is a highly sensitive and precise analytical technique that can be used to identify and quantify trace elements, for chemical analysis of the sapphires. Here we have found that the major element of blue sapphires from Rwanda is Al with trace elements such as Fe, Ti, Cr, Ga and Mg as are commonly found in normal blue sapphire. On the other hand, we have applied low and medium ion implantations for color improvement of the sapphire. It seems that a high amount of energy transferring during cascade collisions have altered the gems properties. We have clearly seen that the blue color of the sapphires have been intensified after nitrogen ion bombardment. In addition, the gems were also having more transparent and luster. The UV–Vis–NIR measurement detected the modification of their absorption properties, implying of the blue color increasing. Here the mechanism of these modifications is postulated and reported. In any point of view, the bombardment by using nitrogen ion beam is a promising technique for quality improvement of the blue sapphire from Rwanda.

  4. Novel technique for injecting and extracting beams in a circular hadron accelerator without using septum magnets

    Directory of Open Access Journals (Sweden)

    Andrea Franchi

    2015-07-01

    Full Text Available With a few exceptions, all on-axis injection and extraction schemes implemented in circular particle accelerators, synchrotrons, and storage rings, make use of magnetic and electrostatic septa with systems of slow-pulsing dipoles acting on tens of thousands of turns and fast-pulsing dipoles on just a few. The dipoles create a closed orbit deformation around the septa, usually referred to as an orbit bump. A new approach is presented which obviates the need for the septum deflectors. Fast-pulsing elements are still required, but their strength can be minimized by choosing appropriate local accelerator optics. This technique should increase the beam clearance and reduce the usually high radiation levels found around the septa and also reduce the machine impedance introduced by the fast-pulsing dipoles. The basis of the technique is the creation of stable islands around stable fixed points in horizontal phase space. The trajectories of these islands may then be adjusted to match the position and angle of the incoming or outgoing beam.

  5. Recoil separators for radiative capture using radioactive ion beams. Recent advances and detection techniques

    Energy Technology Data Exchange (ETDEWEB)

    Ruiz, Chris [TRIUMF, Vancouver, BC (Canada); Greife, Uwe; Hager, Ulrike [Colorado School of Mines, Golden, CO (United States)

    2014-06-15

    Radiative capture reactions involving the fusion of hydrogen or helium are ubiquitous in the stellar history of the universe, and are some of the most important reactions in the processes that govern nucleosynthesis and energy generation in both static and explosive scenarios. However, radiative capture reactions pose some of the most difficult experimental challenges due to extremely small cross sections. With the advent of recoil separators and techniques in inverse kinematics, it is now possible to measure radiative capture reactions on very short-lived radioactive nuclei, and in the presence of high experimental backgrounds. In this paper we review the experimental needs for making measurements of astrophysical importance on radiative capture reactions. We also review some of the important historical advances in the field of recoil separators as well as describe current techniques and performance milestones, including descriptions of some of the separators most recently working at radioactive ion beam facilities, such as DRAGON at TRIUMF and the DRS at the Holifield Radioactive Ion Beam Facility. We will also summarize some of the scientific highlight measurements at the RIB facilities. (orig.)

  6. Results on the electrochromic and photocatalytic properties of vanadium doped tungsten oxide thin films prepared by reactive dc magnetron sputtering technique

    Science.gov (United States)

    Muthu Karuppasamy, K.; Subrahmanyam, A.

    2008-02-01

    In this investigation, vanadium doped tungsten oxide (V : WO3) thin films are prepared at room temperature by reactive dc magnetron sputtering employing a tungsten-vanadium 'inlay' target. In comparison with pure sputtered tungsten oxide thin films, 11% vanadium doping is observed to decrease the optical band gap, enhance the colour neutral property, decrease the coloration efficiency (from 121 to 13 cm2 C-1), increase the surface work function (4.68-4.83 eV) and significantly enhance the photocatalytic efficiency in WO3 thin films. These observations suggest that (i) vanadium creates defect levels that are responsible for optical band gap reduction, (ii) multivalent vanadium bonding with terminal oxygen in the WO3 lattice gives rise to localized covalent bonds and thus results in an increase in the work function, and (iii) a suitable work function of V : WO3 with ITO results in an enhancement of the photocatalytic activity. These results on electrochromic and photocatalytic properties of V : WO3 thin films show good promise in the low maintenance window application.

  7. Results on the electrochromic and photocatalytic properties of vanadium doped tungsten oxide thin films prepared by reactive dc magnetron sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Karuppasamy, K Muthu; Subrahmanyam, A [Semiconductor Laboratory, Department of Physics, Indian Institute of Technology Madras, Chennai 600036 (India)

    2008-02-07

    In this investigation, vanadium doped tungsten oxide (V : WO{sub 3}) thin films are prepared at room temperature by reactive dc magnetron sputtering employing a tungsten-vanadium 'inlay' target. In comparison with pure sputtered tungsten oxide thin films, 11% vanadium doping is observed to decrease the optical band gap, enhance the colour neutral property, decrease the coloration efficiency (from 121 to 13 cm{sup 2} C{sup -1}), increase the surface work function (4.68-4.83 eV) and significantly enhance the photocatalytic efficiency in WO{sub 3} thin films. These observations suggest that (i) vanadium creates defect levels that are responsible for optical band gap reduction, (ii) multivalent vanadium bonding with terminal oxygen in the WO{sub 3} lattice gives rise to localized covalent bonds and thus results in an increase in the work function, and (iii) a suitable work function of V : WO{sub 3} with ITO results in an enhancement of the photocatalytic activity. These results on electrochromic and photocatalytic properties of V : WO{sub 3} thin films show good promise in the low maintenance window application.

  8. Three-dimensional particle simulation of back-sputtered carbon in electric propulsion test facility

    Science.gov (United States)

    Zheng, Hongru; Cai, Guobiao; Liu, Lihui; Shang, Shengfei; He, Bijiao

    2017-03-01

    The back-sputtering deposition on thruster surface caused by ion bombardment on chamber wall material affects the performance of thrusters during the ground based electric propulsion endurance tests. In order to decrease the back-sputtering deposition, most of vacuum chambers applied in electric propulsion experiments are equipped with anti-sputtering targets. In this paper, a three-dimensional model of plume experimental system (PES) including double layer anti-sputtering target is established. Simulation cases are made to simulate the plasma environment and sputtering effects when an ion thruster is working. The particle in cell (PIC) method and direct simulation Monte Carlo (DSMC) method is used to calculate the velocity and position of particles. Yamamura's model is used to simulate the sputtering process. The distribution of sputtered anti-sputtering target material is presented. The results show that the double layer anti-sputtering target can significantly reduce the deposition on thruster surface. The back-sputtering deposition rates on thruster exit surface for different cases are compared. The chevrons on the secondary target are rearranged to improve its performance. The position of secondary target has relation with the ion beam divergence angle, and the radius of the vacuum chamber. The back-sputtering deposition rate is lower when the secondary target covers the entire ion beam.

  9. Effect of the dopant content on the physical properties of Y{sub 2}O{sub 3}-ZrO{sub 2} and CaO-ZrO{sub 2} thin films produced by evaporation and sputtering techniques

    Energy Technology Data Exchange (ETDEWEB)

    Boulouz, M. [Montpellier Univ-2, 34 (France). Centre d' Electronique de Montpellier; Martin, L. [Groupe d' etude des semiconducteurs (GES), Universite Montpellier II, Montpellier (France); Boulouz, A.; Boyer, A. [Centre d' Electronique et de Micro-optoelectronique de Montpellier, UMR 5507 CNRS-Universite Montpellier II, Sciences et Techniques du Languedoc, Place Eugene Bataillon, 34095, Montpellier (France)

    1999-12-15

    This paper describes the preparation and the characterization of zirconia-doped yttria (or calcia) produced by reactive thermal evaporation (RTE) and r.f. magnetron sputtering (R.F.MS) methods. The crystallographic, microstructural and optical properties of the deposited films were investigated as a function of dopant concentration in the ZrO{sub 2} matrix. X-ray diffraction (XRD) analysis permits the study of the stabilization process, lattice parameter and residual stress. XRD patterns show a gradual change in the crystalline structure from a monoclinic phase to a single cubic phase with increasing Y{sub 2}O{sub 3} (or CaO) mole percentage (mol%). The cubic lattice parameter seems to increase with increasing dopant mol%. A merely indicative stress study in stabilized samples shows tensile stress in the ZrO{sub 2}-Y{sub 2}O{sub 3} system obtained by co-evaporation. Residual stresses were highly compressive in ZrO{sub 2}-Y{sub 2}O{sub 3} (or CaO) systems deposited by the sputtering technique. Scanning electron microscopy (SEM) revealed a columnar structure for the overall films. Sputtered zirconia-based films show smooth surface topography with smaller crystallite dimensions. The film refractive index, the packing density and the absorption coefficient are determined in the wavelength range 350-800 nm from the measured reflectance and transmittance at normal incidence. All doped ZrO{sub 2} films exhibit high optical transmission over most of the visible and near infrared spectrum. The refractive index decreased with increasing dopant content and agreed reasonably well with published values for ZrO{sub 2} films. Bulk like refractive index with nearly unity packing density have been obtained for the samples containing 4-7 mol% Y{sub 2}O{sub 3} deposited by the sputtering method. The results suggest that the physical constant of ZrO{sub 2}-based films are principally determined by the crystallographic form rather than by the nature or amount of the added cation. (orig.)

  10. AN IMPEDANCE ANALYSIS FOR CRACK DETECTION IN THE TIMOSHENKO BEAM BASED ON THE ANTI-RESONANCE TECHNIQUE

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    An alternative technique for crack detection in a Timoshenko beam based on the first anti-resonant frequency is presented in this paper. Unlike the natural frequency, the anti-resonant frequency is a local parameter rather than a global parameter of structures, thus the proposed technique can be used to locate the structural defects. An impedance analysis of a cracked beam stimulated by a harmonic force based on the Timoshenko beam formulation is investigated. In order to characterize the local discontinuity due to cracks, a rotational spring model based on fracture mechanics is proposed to model the crack. Subsequently, the proposed method is verified by a numerical example of a simply-supported beam with a crack. The effect of the crack size on the anti-resonant frequency is investigated. The position of the crack of the simply-supported beam is also determined by the anti-resonance technique. The proposed technique is further applied to the "contaminated" anti-resonant frequency to detect crack damage, which is obtained by adding 1-3% noise to the calculated data. It is found that the proposed technique is effective and free from the environment noise. Finally, an experimental study is performed, which further verifies the validity of the proposed crack identification technique.

  11. Implementation of a SVWP-based laser beam shaping technique for generation of 100-mJ-level picosecond pulses.

    Science.gov (United States)

    Adamonis, J; Aleknavičius, A; Michailovas, K; Balickas, S; Petrauskienė, V; Gertus, T; Michailovas, A

    2016-10-01

    We present implementation of the energy-efficient and flexible laser beam shaping technique in a high-power and high-energy laser amplifier system. The beam shaping is based on a spatially variable wave plate (SVWP) fabricated by femtosecond laser nanostructuring of glass. We reshaped the initially Gaussian beam into a super-Gaussian (SG) of the 12th order with efficiency of about 50%. The 12th order of the SG beam provided the best compromise between large fill factor, low diffraction on the edges of the active media, and moderate intensity distribution modification during free-space propagation. We obtained 150 mJ pulses of 532 nm radiation. High-energy, pulse duration of 85 ps and the nearly flat-top spatial profile of the beam make it ideal for pumping optical parametric chirped pulse amplification systems.

  12. Molecular anions sputtered from fluorides

    CERN Document Server

    Gnaser, H

    2002-01-01

    The emission of negatively charged ions from different fluoride samples (LiF, CaF sub 2 , LaF sub 3 and HfF sub 4) induced by sputtering with a 14.5-keV Cs sup + ion beam was studied. Sputtered ions were detected in a high-sensitivity double-focusing mass spectrometer. In particular, the possible existence of small doubly charged negative molecular ions was investigated. But whereas singly charged species of the general type MF sub n sup - (where M represents a metal atom) were detected with high abundances, stable dianions were observed in an unambiguous way only for one molecule: HfF sub 6 sup 2 sup -. The flight time through the mass spectrometer of approx 35 mu s establishes a lower limit with respect to the intrinsic lifetime of this doubly charged ion. For singly charged anions abundance distributions and, in selected cases, emission-energy spectra were recorded. For two ion species (Ca sup - and HfF sub 5 sup -) isotopic fractionation effects caused by the (velocity dependent) ionization process were d...

  13. Investigation of chemical vapour deposition diamond detectors by X- ray micro-beam induced current and X-ray micro-beam induced luminescence techniques

    CERN Document Server

    Olivero, P; Vittone, E; Fizzotti, F; Paolini, C; Lo Giudice, A; Barrett, R; Tucoulou, R

    2004-01-01

    Tracking detectors have become an important ingredient in high-energy physics experiments. In order to survive the harsh detection environment of the Large Hadron Collider (LHC), trackers need to have special properties. They must be radiation hard, provide fast collection of charge, be as thin as possible and remove heat from readout electronics. The unique properties of diamond allow it to fulfill these requirements. In this work we present an investigation of the charge transport and luminescence properties of "detector grade" artificial chemical vapour deposition (CVD) diamond devices developed within the CERN RD42 collaboration, performed by means of X-ray micro-beam induced current collection (XBICC) and X-ray micro- beam induced luminescence (XBIL) techniques. XBICC technique allows quantitative estimates of the transport parameters of the material to be evaluated and mapped with micrometric spatial resolution. In particular, the high resolution and sensitivity of the technique has allowed a quantitati...

  14. Photoluminescence and compositional-structural properties of ion-beam sputter deposited Er-doped TiO{sub 2−x}N{sub x} films: Their potential as a temperature sensor

    Energy Technology Data Exchange (ETDEWEB)

    Scoca, D., E-mail: dlsscoca@ifi.unicamp.br; Morales, M.; Merlo, R.; Alvarez, F. [Instituto de Física Gleb Wataghin, UNICAMP, Campinas, São Paulo (Brazil); Zanatta, A. R. [Instituto de Física de São Carlos, USP, São Carlos, São Paulo (Brazil)

    2015-05-28

    Er-doped TiO{sub 2−x}N{sub x} films were grown by Ar{sup +} ion-beam sputtering a Ti + Er target under different N{sub 2} + O{sub 2} high-purity atmospheres. The compositional-structural properties of the samples were investigated after thermal annealing the films up to 1000 °C under a flow of oxygen. Sample characterization included x-ray photoelectron spectroscopy, grazing incidence x-ray diffraction, Raman scattering, and photoluminescence experiments. According to the experimental data, both composition and atomic structure of the samples were very sensitive to the growth conditions and annealing temperature. In the as-deposited form, the N-rich TiO{sub 2−x}N{sub x} films presented TiN crystallites and no photoluminescence. As the thermal treatments proceed, the films were transformed into TiO{sub 2} and Er{sup 3+}-related light emission were observed in the visible and near-infrared ranges at room-temperature. Whereas the development of TiO{sub 2} occurred due to the insertion-diffusion of oxygen in the films, light emission originated because of optical bandgap widening and/or structural-chemical variations in the vicinity of the Er{sup 3+} ions. Finally, the photoluminescence results in the visible range suggested the potential of the present samples in producing an optically based temperature sensor in the ∼150–500 K range.

  15. Estimation of bending wave intensity in beams using the frequency response technique

    Science.gov (United States)

    Linjama, J.; Lahti, T.

    1992-02-01

    The frequency response approach is applied to the measurement of bending wave intensity, with two or four accelerometers being used. Based on the known structural intensity equations, a comprehensive set of frequency domain expressions is derived for power measurements in a beam. A practical procedure is developed for the general four-transducer method, which allows a usual dual channel FFT analyzer to be employed in multi-channel measurements. The procedure uses the sequential frequency response technique, and is applicable if the situation remains stationary during the data acquisition. In addition, expressions are derived for the determination of the force- and moment-related bending wave power components separately. In a laboratory experiment, the power carried by bending waves was measured in a simple beam, and the methods developed were tested and compared. The frequency response approach was shown to work well in detecting the total power. The estimation of the two bending wave power components, both in the near and the far field, was also demonstrated.

  16. Characterization techniques for the high-brightness particle beams of the Advanced Photon Source (APS)

    Energy Technology Data Exchange (ETDEWEB)

    Lumpkin, A.H.

    1993-08-01

    The Advanced Photon Source (APS) will be a third-generation synchrotron radiation (SR) user facility in the hard x-ray regime (10--100 keV). The design objectives for the 7-GeV storage ring include a positron beam natural emittance of 8 {times} 10{sup {minus}9} m-rad at an average current of 100 mA. Proposed methods for measuring the transverse and longitudinal profiles will be described. Additionally, a research and development effort using an rf gun as a low-emittance source of electrons for injection into the 200- to 650-MeV linac subsystem is underway. This latter system is projected to produce electron beams with a normalized, rms emittance of {approximately}2 {pi} mm-mrad at peak currents of near one hundred amps. This interesting characterization problem will also be briefly discussed. The combination of both source types within one laboratory facility will stimulate the development of diagnostic techniques in these parameter spaces.

  17. All-optical optoacoustic microscopy based on probe beam deflection technique

    Directory of Open Access Journals (Sweden)

    Saher M. Maswadi

    2016-09-01

    Full Text Available Optoacoustic (OA microscopy using an all-optical system based on the probe beam deflection technique (PBDT for detection of laser-induced acoustic signals was investigated as an alternative to conventional piezoelectric transducers. PBDT provides a number of advantages for OA microscopy including (i efficient coupling of laser excitation energy to the samples being imaged through the probing laser beam, (ii undistorted coupling of acoustic waves to the detector without the need for separation of the optical and acoustic paths, (iii high sensitivity and (iv ultrawide bandwidth. Because of the unimpeded optical path in PBDT, diffraction-limited lateral resolution can be readily achieved. The sensitivity of the current PBDT sensor of 22 μV/Pa and its noise equivalent pressure (NEP of 11.4 Pa are comparable with these parameters of the optical micro-ring resonator and commercial piezoelectric ultrasonic transducers. Benefits of the present prototype OA microscope were demonstrated by successfully resolving micron-size details in histological sections of cardiac muscle.

  18. Denoising of electron beam Monte Carlo dose distributions using digital filtering techniques

    Science.gov (United States)

    Deasy, Joseph O.

    2000-07-01

    The Monte Carlo (MC) method has long been viewed as the ultimate dose distribution computational technique. The inherent stochastic dose fluctuations (i.e. noise), however, have several important disadvantages: noise will affect estimates of all the relevant dosimetric and radiobiological indices, and noise will degrade the resulting dose contour visualizations. We suggest the use of a post-processing denoising step to reduce statistical fluctuations and also improve dose contour visualization. We report the results of applying four different two-dimensional digital smoothing filters to two-dimensional dose images. The Integrated Tiger Series MC code was used to generate 10 MeV electron beam dose distributions at various depths in two different phantoms. The observed qualitative effects of filtering include: (a) the suppression of voxel-to-voxel (high-frequency) noise and (b) the resulting contour plots are visually more comprehensible. Drawbacks include, in some cases, slight blurring of penumbra near the surface and slight blurring of other very sharp real dosimetric features. Of the four digital filters considered here, one, a filter based on a local least-squares principle, appears to suppress noise with negligible degradation of real dosimetric features. We conclude that denoising of electron beam MC dose distributions is feasible and will yield improved dosimetric reliability and improved visualization of dose distributions.

  19. Denoising of electron beam Monte Carlo dose distributions using digital filtering techniques

    Energy Technology Data Exchange (ETDEWEB)

    Deasy, Joseph O. [Mallinckrodt Institute of Radiology, Washington University School of Medicine, 510 So. Kingshighway Blvd, St Louis, MO 63110 (United States). E-mail: deasy at radonc.wustl.edu

    2000-07-01

    The Monte Carlo (MC) method has long been viewed as the ultimate dose distribution computational technique. The inherent stochastic dose fluctuations (i.e. noise), however, have several important disadvantages: noise will affect estimates of all the relevant dosimetric and radiobiological indices, and noise will degrade the resulting dose contour visualizations. We suggest the use of a post-processing denoising step to reduce statistical fluctuations and also improve dose contour visualization. We report the results of applying four different two-dimensional digital smoothing filters to two-dimensional dose images. The Integrated Tiger Series MC code was used to generate 10 MeV electron beam dose distributions at various depths in two different phantoms. The observed qualitative effects of filtering include: (a) the suppression of voxel-to-voxel (high-frequency) noise and (b) the resulting contour plots are visually more comprehensible. Drawbacks include, in some cases, slight blurring of penumbra near the surface and slight blurring of other very sharp real dosimetric features. Of the four digital filters considered here, one, a filter based on a local least-squares principle, appears to suppress noise with negligible degradation of real dosimetric features. We conclude that denoising of electron beam MC dose distributions is feasible and will yield improved dosimetric reliability and improved visualization of dose distributions. (author)

  20. Poly(methyl methacrylate) Composites with Size-selected Silver Nanoparticles Fabricated Using Cluster Beam Technique

    DEFF Research Database (Denmark)

    Muhammad, Hanif; Juluri, Raghavendra R.; Chirumamilla, Manohar

    2016-01-01

    based on cluster beam technique allowing the formation of monocrystalline size-selected silver nanoparticles with a ±5–7% precision of diameter and controllable embedment into poly (methyl methacrylate). It is shown that the soft-landed silver clusters preserve almost spherical shape with a slight......An embedment of metal nanoparticles of well-defined sizes in thin polymer films is of significant interest for a number of practical applications, in particular, for preparing materials with tunable plasmonic properties. In this article, we present a fabrication route for metal–polymer composites...... tendency to flattening upon impact. By controlling the polymer hardness (from viscous to soft state) prior the cluster deposition and annealing conditions after the deposition the degree of immersion of the nanoparticles into polymer can be tuned, thus, making it possible to create composites with either...

  1. p-Type Transparent NiO Thin Films By e-Beam Evaporation Techniques

    Directory of Open Access Journals (Sweden)

    K.J. Patel1,

    2011-01-01

    Full Text Available Nickel oxide (NiO semiconductors thin films were prepared by e-beam evaporation technique at different substrate temperatures ranging from room temperature to 400 °C on glass substrate. Glancing incident X-ray diffraction depict that with the increases in substrate temperature the preferred orientation changes from (111 to (200 direction. Atomic force microscopy was used to investigate the surface morphology of the NiO thin films. The transmittance of NiO thin film increases with substrate temperature. NiO thin film was also deposited on n-type indium tin oxide (ITO thin films to investigate the diode characteristic of p-NiO/n-ITO junction.

  2. Characterization of Inx Ga1-x As-GaAs heterostructures via electron beam techniques

    Science.gov (United States)

    Gomez-Barojas, Estela; Silva-Gonzalez, Rutilo; Serrano-Rojas, Rosa Maria; Vidal-Borbolla, Miguel Angel

    2005-03-01

    In the case of strained superlattices abrupt heterointerfaces are required because compositional fluctuations at heterointerfaces results in uncertainty in both composition and lattice constant. The aim of this work is to study exsitu the surface morphology, the periodicity and elemental composition of a set of 3 InGaAs-GaAs heterostructures grown on GaAs (100) substrates by a molecular beam epitaxy system. The heterostructures are formed by 10 periods of InGaAs-GaAs epitaxially grown on GaAs substrates with nominal thickness of 500 and 1000 å, respectively. The techniques used for this purpose are the scanning electron microscopy (SEM) and Auger electron spectroscopy (AES). The In content in the heterostructures is determined from corresponding Auger depth profiles. This work has been supported by VIEP-BUAP, Project No. II53G02.

  3. Characterization of natural and modified zeolites using ion beam analysis techniques

    Energy Technology Data Exchange (ETDEWEB)

    Andrade, E. [Instituto de Fisica, Departamento de Fisica Experimental, Universidad Nacional Autonoma de Mexico, Apdo. Postal 20-364, 01000 (Mexico)], E-mail: andrade@fisica.unam.mx; Solis, C. [Instituto de Fisica, Departamento de Fisica Experimental, Universidad Nacional Autonoma de Mexico, Apdo. Postal 20-364, 01000 (Mexico); Aceves, J.M.; Miranda, R. [Facultad de Estudios Superiores Cuautitlan Itzcalli, Departamento de Quimica, Universidad Nacional Autonoma de Mexico, 1 de Mayo S/N, Cuatitlan Itzcalli, Edo. de Mexico, C.P. 74540 (Mexico); Cruz, J. [Instituto de Fisica, Departamento de Fisica Experimental, Universidad Nacional Autonoma de Mexico, Apdo. Postal 20-364, 01000 (Mexico); Rocha, M.F. [Escuela Superior de Ingenieria Mecanica y Electrica, Instituto Politecnico Nacional, U.P. ' Adolfo Lopez Mateos' , Zacatenco, Del. Gustavo A. Madero, Mexico D.F. 07738 (Mexico); Zavala, E.P. [Instituto de Fisica, Departamento de Fisica Experimental, Universidad Nacional Autonoma de Mexico, Apdo. Postal 20-364, 01000 (Mexico)

    2008-05-15

    Zeolites are very important materials in catalytic and industrial processes. Natural, modified and synthetic zeolites have a wide range of uses because of their good adsorption, ion exchange capacity and catalytic properties. Mexico is an import source of natural zeolites, however their utilization in the natural form is limited due to the presence of trace metallic impurities. For example, metals such as vanadium and chromium inhibit the elimination of sulfur in hydrocarbons. Therefore, it is important to know the precise composition of the zeolite material. In this work, we report the elemental characterization of zeolites using various IBA techniques. {sup 3}He{sup +} and {sup 2}H{sup +} beams were used to measure the major element concentrations (Si, Al, O, C) by RBS and NRA. PIXE and SEM-EDS were used to measure the total trace element content (V, Cr, Fe, Ni, Cu, Zn, Rb, Sr, Zr, Pb, etc). Additionally, XRD was used to study the zeolite crystal structure.

  4. A Beam-Fourier Technique for the Numerical Investigation of 2D Nonlinear Convective Flows

    Science.gov (United States)

    Papanicolaou, N. C.

    2011-11-01

    In the current work, we develop a numerical method suitable for treating the problem of nonlinear two-dimensional flows in rectangular domains. For the spatial approximation we employ the Fourier-Galerkin approach. More specifically, our basis functions are products of trigonometric and Beam functions. This choice means that the solutions automatically satisfy the boundary and periodic conditions in the x and y directions respectively. The accuracy of the method is assessed by applying it to model problems which admit exact analytical solutions. The numerical and analytic solutions are found to be in good agreement. The convergence rate of the spectral coefficients is found to be fifth-order algebraic in the x-direction and y-direction, confirming the efficiency and speed of our technique.

  5. Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering

    Institute of Scientific and Technical Information of China (English)

    ZHANG Lei; HE Zhi-Jiang; LIU Chao-Zhuo; WANG Xu-Fei; SHI Li-Qun

    2012-01-01

    Helium contents of up to 30at.% are prepared in sputter-deposited Ti Silms. Isochronal annealing behaviors of helium including the depth profiles and the evolution of helium bubbles in the fi1ms at different temperatures are examined by ion beam analysis including Rutherford backscattering spectrometry (RBS) and elastic recoil detection analysis (ERDA), as well as thermal helium desorption spectroscopy (THDS). It is found that the energy spreading induced by structural inhomogeneities in the spectra of RBS and ERDA as well as the increment in the width of spectra occurs, which corresponds to the change of stopping cross-section of helium atoms in the Ti 61m due to the change of physical-state of helium in the evolution of helium bubble. The ion beam analysis on the helium evolution is consistent with the THDS measurement. Ion beam technique opens interesting possibilities in the characterizing on the growth of helium bubbles.%Helium contents of up to 30at.% are prepared in sputter-deposited Ti films.Isochronal annealing behaviors of helium including the depth profiles and the evolution of helium bubbles in the films at different temperatures are examined by ion beam analysis including Rutherford backscattering spectrometry (RBS) and elastic recoil detection analysis (ERDA),as well as thermal helium desorption spectroscopy (THDS).It is found that the energy spreading induced by structural inhomogeneities in the spectra of RBS and ERDA as well as the increment in the width of spectra occurs,which corresponds to the change of stopping cross-section of helium atoms in the Ti film due to the change of physical-state of helium in the evolution of helium bubble.The ion beam analysis on the helium evolution is consistent with the THDS measurement.Ion beam technique opens interesting possibilities in the characterizing on the growth of helium bubbles.

  6. Total skin electron beam therapy in mycosis fungoides. Evaluation of a technique for deceleration of electron beam energy and clinical study

    Energy Technology Data Exchange (ETDEWEB)

    Terashima, Hiromi; Yamashita, Shigeru; Ishino, Yohichi; Suenaga, Yoshinori

    1988-08-01

    The studies using phantoms confirmed that the reduction of electron beam energy and minimization of X-ray contamination could be achieved when electron beam was interposed by an acrylic plate placed 20 cm anterior to a patient. Four patients of mycosis fungoides were treated with 8 MeV electron beam of a linear accelerator at UOEH Hospital from October 1981 to December 1986. Two of them were treated with this technique by placing 2 cm thick acrylic plate anterior to the patients and satisfactory results were obtained. Cutaneous lesions subsided remarkably with the dosage of 2000 cGy given in 2 months. Leucopenia due to bone marrow suppression was mild and the patients tolerated the treatment well.

  7. Determination of the density of the defect states in Hf0.5Zr0.5O2 high-k film Deposited by using rf-magnetron sputtering technique

    Directory of Open Access Journals (Sweden)

    W. Lu

    2014-08-01

    Full Text Available A memory structure Pt/Al2O3/Hf0.5Zr0.5O2/Al2O3/p-Si was fabricated by using atomic layer deposition and rf-magnetron sputtering techniques, and its microstructure has been investigated by using the high resolution transmission electron microscopy (HRTEM. By measuring the applied gate voltage dependence of the capacitance for the memory structure, the planar density of the trapped charges in Hf0.5Zr0.5O2 high-k film was estimated as 6.63 × 1012 cm−2, indicating a body defect density of larger than 2.21 × 1019 cm−3. It is observed that the post-annealing in N2 can reduces the defect density in Hf0.5Zr0.5O2 film, which was ascribed to the occupancy of oxygen vacancies by nitrogen atoms.

  8. Influence of the surface topography, morphology and structure on magnetic properties of ion beam sputtered iron layers, Fe/Cr/Fe- and Fe/MgO/Fe multilayers; Untersuchung der Morphologie und magnetische Eigenschaften von ionenstrahl-gesputterten Eisen-Einzelschichten, Fe/Cr/Fe- und Fe/MgO/Fe-Schichtsystemen

    Energy Technology Data Exchange (ETDEWEB)

    Steeb, Alexandra

    2007-04-05

    In this PhD Thesis, the influence of the surface topography, morphology and structure on magnetic properties of ion beam sputtered iron layers on GaAs is examined. To analyze the structure of the produced iron films, low energy electron diffraction and scanning tunneling microscopy is employed. The utilized methods to investigate the magnetic properties are Kerr- and SQUID-magnetometry and ferromagnetic resonance. It is demonstrated that on untreated as well as on presputtered and heated GaAs substrates the sputtered iron films grow epitaxially. The least surface roughness of 1 A exhibit iron films grown on untreated GaAs, while iron films on heated GaAs have the highest roughness of 30 A. The largest crystal anisotropy constant is found for the presputtered GaAs/Fe-System. For this preparation method, two monolayers of iron are determined to be magnetically dead layers. At a film thickness of 100 A, 83% of the value for saturation magnetization of bulk iron are achieved. The small observed FMR-linewidths confirm the good bulk properties of the ion beam sputtered iron. Furthermore, an antiferromagnetic interlayer exchange coupling in sputtered Fe/Cr/Fe-films was achieved. For a thickness of 12 to 17 A of the chrome interlayer, a coupling strength up to 0.2 mJ/m{sup 2} is found. To account for the small coupling strength, a strong intermixing at the interface is assumed. Finally, epitaxial Fe/MgO/Fe/FeMn multilayers are deposited on GaAs. After the structuring, it is possible to detect tunneling processes in the tunneling contacts with current-voltage measurements. The tunnel magneto resistance values of 2% are small, which can be explained by the absence of sharp, well-defined interfaces between the Fe/FeMn and the Fe/MgO interfaces. These results demonstrate, that analog to MBE the ion beam sputtering method realizes good magnetic bulk properties. However, interface sensitive phenomena are weakened because of a strong intermixing at the interfaces. (orig.)

  9. Production of fullerene ions by combining of plasma sputtering with laser ablation

    Energy Technology Data Exchange (ETDEWEB)

    Yamada, K., E-mail: yamada.keisuke@jaea.go.jp; Saitoh, Y.; Yokota, W. [Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki, Takasaki, Gunma 370-1292 (Japan)

    2014-02-15

    We have produced C{sub 60} ion beams by combining plasma sputtering and laser ablation. A C{sub 60} sample was placed in an electron cyclotron resonance type ion source, negatively biased and sputtered by argon plasma. The beam current of C{sub 60}{sup +} decreased rapidly, but it was transiently recovered by a single laser shot that ablates the thin sample surface on the sputtered area. Temporal variations in beam current are reported in response to laser shots repeated at intervals of a few minutes.

  10. Robust breathing signal extraction from cone beam CT projections based on adaptive and global optimization techniques

    Science.gov (United States)

    Chao, Ming; Wei, Jie; Li, Tianfang; Yuan, Yading; Rosenzweig, Kenneth E.; Lo, Yeh-Chi

    2016-04-01

    We present a study of extracting respiratory signals from cone beam computed tomography (CBCT) projections within the framework of the Amsterdam Shroud (AS) technique. Acquired prior to the radiotherapy treatment, CBCT projections were preprocessed for contrast enhancement by converting the original intensity images to attenuation images with which the AS image was created. An adaptive robust z-normalization filtering was applied to further augment the weak oscillating structures locally. From the enhanced AS image, the respiratory signal was extracted using a two-step optimization approach to effectively reveal the large-scale regularity of the breathing signals. CBCT projection images from five patients acquired with the Varian Onboard Imager on the Clinac iX System Linear Accelerator (Varian Medical Systems, Palo Alto, CA) were employed to assess the proposed technique. Stable breathing signals can be reliably extracted using the proposed algorithm. Reference waveforms obtained using an air bellows belt (Philips Medical Systems, Cleveland, OH) were exported and compared to those with the AS based signals. The average errors for the enrolled patients between the estimated breath per minute (bpm) and the reference waveform bpm can be as low as  -0.07 with the standard deviation 1.58. The new algorithm outperformed the original AS technique for all patients by 8.5% to 30%. The impact of gantry rotation on the breathing signal was assessed with data acquired with a Quasar phantom (Modus Medical Devices Inc., London, Canada) and found to be minimal on the signal frequency. The new technique developed in this work will provide a practical solution to rendering markerless breathing signal using the CBCT projections for thoracic and abdominal patients.

  11. Sputtering yields of carbon based materials under high particle flux with low energy

    Science.gov (United States)

    Nakamura, K.; Nagase, A.; Dairaku, M.; Akiba, M.; Araki, M.; Okumura, Y.

    1995-04-01

    A new ion source which can produce high particle flux beams at low energies has been developed. This paper presents preliminary results on the sputtering yield of the carbon fiber reinforced composites (CFCs) measured with the new ion source. The sputtering yields of 1D and 2D CFCs, which are candidate materials for the divertor armour tiles, have been measured by the weight loss method under the hydrogen and deuterium particle fluxes of 2 ˜ 7 × 10 20/m 2 s at 50 ˜ 150 eV. Preferential sputtering of the matrix was observed on CFCs which included the matrix of 40 ˜ 60 w%. The energy dependence of the sputtering yields was weak. The sputtering yields of CFCs normally irradiated with deuterium beam were from 0.073 to 0.095, and were around three times larger than those with hydrogen beam.

  12. A New Technique for Diagnosing Multi-charged Ion Beams Produced by ECR Ion Source

    Institute of Scientific and Technical Information of China (English)

    ZhangZimin; ZhaoHongwei; CaoYun; MaLei; MaBaohua; LiJinyu; WangHui; FengYucheng; DuJunfeng

    2003-01-01

    In order to study the transmission properties of multi-charged ion beams between the ECR ion source and the analyzing magnet, a new diagnostic system composed of three Wien-filters with three single-wires has been built and installed on the IMP ECR source test bcnch. The single-wire is used to measure the beam profile and the beam density distribution, and the Wien-filter is used to measure the charge state distribution of ion beam.

  13. Designed-seamless irradiation technique for extended whole mediastinal proton-beam irradiation for esophageal cancer

    Directory of Open Access Journals (Sweden)

    Okonogi Noriyuki

    2012-10-01

    Full Text Available Abstract Background Proton-beam therapy (PBT provides therapeutic advantages over conformal x-ray therapy in sparing organs at risk when treating esophageal cancer because of the fundamental physical dose distribution of the proton-beam. However, cases with extended esophageal lesions are difficult to treat with conventional PBT with a single isocentric field, as the length of the planning target volume (PTV is longer than the available PBT field size in many facilities. In this study, the feasibility of a practical technique to effectively match PBT fields for esophageal cancer with a larger regional field beyond the available PBT field size was investigated. Methods Twenty esophageal cancer patients with a larger regional field than the available PBT single-field size (15 cm in our facility were analyzed. The PTV was divided into two sections to be covered by a single PBT field. Subsequently, each PTV isocenter was aligned in a cranial-caudal (CC axis to rule out any influence by the movement of the treatment couch in anterior-posterior and left-right directions. To obtain the appropriate dose distributions, a designed-seamless irradiation technique (D-SLIT was proposed. This technique requires the following two adjustments: (A blocking a part of the PTV by multi-leaf collimator(s (MLCs; and (B fine-tuning the isocenter distance by the half-width of the MLC leaf (2.5 mm in our facility. After these steps, the inferior border of the cranial field was designed to match the superior border of the caudal field. Dose distributions along the CC axis around the field junction were evaluated by the treatment-planning system. Dose profiles were validated with imaging plates in all cases. Results The average and standard deviation of minimum dose, maximum dose, and dose range between maximum and minimum doses around the field junction by the treatment-planning system were 95.9 ± 3.2%, 105.3 ± 4.1%, and 9.4 ± 5.2%. The dose profile validated by the

  14. Fabrication of high-transmission microporous membranes by proton beam writing-based molding technique

    Science.gov (United States)

    Wang, Liping; Meyer, Clemens; Guibert, Edouard; Homsy, Alexandra; Whitlow, Harry J.

    2017-08-01

    Porous membranes are widely used as filters in a broad range of micro and nanofluidic applications, e.g. organelle sorters, permeable cell growth substrates, and plasma filtration. Conventional silicon fabrication approaches are not suitable for microporous membranes due to the low mechanical stability of thin film substrates. Other techniques like ion track etching are limited to the production of randomly distributed and randomly orientated pores with non-uniform pore sizes. In this project, we developed a procedure for fabricating high-transmission microporous membranes by proton beam writing (PBW) with a combination of spin-casting and soft lithography. In this approach, focused 2 MeV protons were used to lithographically write patterns consisting of hexagonal arrays of high-density pillars of few μm size in a SU-8 layer coated on a silicon wafer. After development, the pillars were conformably coated with a thin film of poly-para-xylylene (Parylene)-C release agent and spin-coated with polydimethylsiloxane (PDMS). To facilitate demolding, a special technique based on the use of a laser-cut sealing tape ring was developed. This method facilitated the successful delamination of 20-μm thick PDMS membrane with high-density micropores from the mold without rupture or damage.

  15. Fabrication of superconducting MgB2 nanostructures by an electron beam lithography-based technique

    Science.gov (United States)

    Portesi, C.; Borini, S.; Amato, G.; Monticone, E.

    2006-03-01

    In this work, we present the results obtained in fabrication and characterization of magnesium diboride nanowires realized by an electron beam lithography (EBL)-based method. For fabricating MgB2 thin films, an all in situ technique has been used, based on the coevaporation of B and Mg by means of an e-gun and a resistive heater, respectively. Since the high temperatures required for the fabrication of good quality MgB2 thin films do not allow the nanostructuring approach based on the lift-off technique, we structured the samples combining EBL, optical lithography, and Ar milling. In this way, reproducible nanowires 1 μm long have been obtained. To illustrate the impact of the MgB2 film processing on its superconducting properties, we measured the temperature dependence of the resistance on a nanowire and compared it to the original magnesium diboride film. The electrical properties of the films are not degraded as a consequence of the nanostructuring process, so that superconducting nanodevices may be obtained by this method.

  16. Modulation transfer function determination using the edge technique for cone-beam micro-CT

    Science.gov (United States)

    Rong, Junyan; Liu, Wenlei; Gao, Peng; Liao, Qimei; Lu, Hongbing

    2016-03-01

    Evaluating spatial resolution is an essential work for cone-beam computed tomography (CBCT) manufacturers, prototype designers or equipment users. To investigate the cross-sectional spatial resolution for different transaxial slices with CBCT, the slanted edge technique with a 3D slanted edge phantom are proposed and implemented on a prototype cone-beam micro-CT. Three transaxial slices with different cone angles are under investigation. An over-sampled edge response function (ERF) is firstly generated from the intensity of the slightly tiled air to plastic edge in each row of the transaxial reconstruction image. Then the oversampled ESF is binned and smoothed. The derivative of the binned and smoothed ERF gives the line spread function (LSF). At last the presampled modulation transfer function (MTF) is calculated by taking the modulus of the Fourier transform of the LSF. The spatial resolution is quantified with the spatial frequencies at 10% MTF level and full-width-half-maximum (FWHM) value. The spatial frequencies at 10% of MTFs are 3.1+/-0.08mm-1, 3.0+/-0.05mm-1, and 3.2+/-0.04mm-1 for the three transaxial slices at cone angles of 3.8°, 0°, and -3.8° respectively. The corresponding FWHMs are 252.8μm, 261.7μm and 253.6μm. Results indicate that cross-sectional spatial resolution has no much differences when transaxial slices being 3.8° away from z=0 plane for the prototype conebeam micro-CT.

  17. Effect of Sn Doping on the Properties of Nano-Structured ZnO Thin Films Deposited by Co-Sputtering Technique.

    Science.gov (United States)

    Islam, M A; Rahman, K S; Haque, F; Khan, N A; Akhtaruzzaman, M; Alam, M M; Ruslan, H; Sopian, K; Amin, N

    2015-11-01

    In this study, tin doped zinc oxide (ZnO:Sn) nano-structured thin films were successfully deposited by co-sputtering of ZnO and Sn on top of glass substrate. The effect of Sn doping on the microstructure, phase, morphology, optical and electrical properties of the films were extensively investigated by means of XRD, EDX, SEM, AFM, Hall Effect measurement, and UV-Vis spectrometry. The results showed that the undoped ZnO film exhibited preferred orientation along the c-axis of the hexagonal wurtzite structure. With increase of Sn doping, the peak position of the (002) plane was shifted to the higher 20 values, and ultimately changed to amorphous structure. The absorption edge was shifted to blue region which confirmed the excitonic quantum confinement effect in the films. Consequently, improved surface morphology with optical bandgap, reduced average particle size, reduced resistivity, enhanced Hall mobility and carrier concentration were observed in the doped films after vacuum annealing. Among all of the as-deposited and annealed ZnO:Sn films investigated in this study, annealed film doped with 8 at.% of Sn concentration exhibited the best properties with a bandgap of 3.84 eV, RMS roughness of 2.51 nm, resistivity of 2.36 ohm-cm, and Hall mobility of 83 cm2 V(-1) s(-1).

  18. Sputtering and surface structure modification of gold thin films deposited onto silicon substrates under the impact of 20–160 keV Ar{sup +} ions

    Energy Technology Data Exchange (ETDEWEB)

    Mammeri, S., E-mail: smammeri@yahoo.fr [Centre de Recherche Nucléaire d’Alger, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria); Ouichaoui, S. [Université des Sciences et de la Technologie H. Boumediene (USTHB), Faculté de Physique, Laboratoire SNIRM, B.P. 32, El-Alia, 16111 Bab Ezzouar, Algiers (Algeria); Ammi, H.; Dib, A. [Centre de Recherche Nucléaire d’Alger, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria)

    2014-10-15

    Highlights: •Sputter yields were measured for gold thin films under keV Ar{sup +} ion bombardment. •RBS analysis was used to derive energy dependence of sputtering yield. •Surface effects under Ar{sup +} ion irradiation were studied by SEM and XRD analyses. -- Abstract: The induced sputtering and surface state modification of Au thin films bombarded by swift Ar{sup +} ions under normal incident angle have been studied over an energy range of (20–160) keV using three complementary techniques: Rutherford backscattering spectroscopy (RBS), scanning electron microscopy (SEM) and X-ray diffraction (XRD). The sputtering yields determined by RBS measurements using a 2 MeV {sup 4}He{sup +} ion beam were found to be consistent with previous data measured within the Ar{sup +} ion energy region E ⩽ 50 keV, which are thus extended to higher bombarding energies. Besides, the SEM and XRD measurements clearly point out that the irradiated Au film surfaces undergo drastic modifications with increasing the Ar{sup +} ion energy, giving rise to the formation of increasingly sized grains of preferred (1 1 1) crystalline orientations. The relevance of different sputtering yield models for describing experimental data is discussed with invoking the observed surface effects induced by the Ar{sup +} ion irradiation.

  19. Introduction to analytical techniques of beam-target interactions and resolutions; Introduction aux techniques d`analyse interactions rayonnement-matiere et resolutions

    Energy Technology Data Exchange (ETDEWEB)

    Ruste, J.

    1995-08-01

    For several years, new analysis and observation techniques have been developed, which have considerably improved material research. Almost all these techniques are based on the interaction of a beam of `primary particles` (electrons, photons, ions, particles, etc) with target. Correct and appropriate use of these techniques requires a good knowledge of these interactions and their consequences (emissions of `secondary particles`, modifications of the primary beam and target, etc). The first part of this report deals with the radiation/material interactions according to the nature of the radiation and its energy. The nature and consequences of the interaction of an electromagnetic wave, a beam of electrons, ions and neutrons are examined over an extended range of energy from MeV to MeV. Certain notions such as the analysis area, spatial resolutions or limits of detection can also be defined. In the second part, some of the most important and widespread techniques of analysis and observation are compared in terms of properties and performance. In particular, there is a brief principle of the technique, nature of the data obtained, spatial resolution, and the limits of detection with today`s methods permit. (author). 5 refs., 23 figs., 9 tabs.

  20. An anthropomorphic breathing phantom of the thorax for testing new motion mitigation techniques for pencil beam scanning proton therapy

    NARCIS (Netherlands)

    Perrin, R L; Zakova, M; Peroni, Marta; Bernatowicz, K; Bikis, C; Knopf, A. K.; Safai, S; Fernandez-Carmona, P; Tscharner, N; Weber, Damien C.; Parkel, T C; Lomax, Antony J.

    2017-01-01

    Motion-induced range changes and incorrectly placed dose spots strongly affect the quality of pencil-beam-scanned (PBS) proton therapy, especially in thoracic tumour sites, where density changes are large. Thus motion-mitigation techniques are necessary, which must be validated in a realistic

  1. Enhancement of negative capacitance effect in (CoFeZr){sub x}(CaF{sub 2}){sub (100−x)} nanocomposite films deposited by ion beam sputtering in argon and oxygen atmosphere

    Energy Technology Data Exchange (ETDEWEB)

    Koltunowicz, T.N., E-mail: t.koltunowicz@pollub.pl [Lublin University of Technology, 20-618 Lublin (Poland); Zhukowski, P., E-mail: p.zhukowski@pollub.pl [Lublin University of Technology, 20-618 Lublin (Poland); Bondariev, V. [Lublin University of Technology, 20-618 Lublin (Poland); Saad, A. [Al Balqa Applied University, Physics Department, P.O. Box 4545, Amman 11953 (Jordan); Fedotova, J.A. [National Center for Particles and High Energy Physics of Belarusian State University, 220040 Minsk (Belarus); Fedotov, A.K. [Belarusian State University, 220030 Minsk (Belarus); Milosavljević, M. [VINČA Institute of Nuclear Sciences, Belgrade University, P.O. Box 522, 11001 Belgrade (Serbia); Kasiuk, J.V. [National Center for Particles and High Energy Physics of Belarusian State University, 220040 Minsk (Belarus)

    2014-12-05

    Highlights: • (FeCoZr){sub x}(CaF{sub 2}){sub (100−x)} nanomaterals deposited in oxygen-containing atmosphere (Ar + O{sub 2}). • FeCoZr “cores” covered with FeCo-oxide “shells” embedded into nonoxygen dielectric matrix. • On σ(T{sub p}) are two minima related to the crossing zero line values of Θ{sub 1} = 90° and of Θ{sub 2} = −90°. - Abstract: The paper presents frequency f and temperature T{sub p} dependences of phase shift angle Θ, admittance σ and capacitance C{sub p} for the as-deposited and annealed (CoFeZr){sub x}(CaF{sub 2}){sub (100−x)} nanocomposite films deposited by ion-beam sputtering of a compound target in a mixed argon–oxygen gas atmosphere in vacuum chamber. The studied films presented metallic FeCoZr “cores” covered with FeCo-based oxide “shells” embedded into oxygen-free dielectric matrix (fluorite). It was found for the metallic phase content within the range of 52.2 at.% ⩽ x ⩽ 84.3 at.% in low-f region that Θ values were negative, while in the high-f region we observed the Θ < 0{sup o}. It was obtained that the f-dependences of capacitance module displayed minimum at the corresponding frequency when the Θ(f) crossed its zero line Θ = 0{sup o}. It was also observed that the σ(T{sub p}) dependence displayed the occurrence of two minima that were related to the values of Θ{sub 1} = 90° (the first minimum) and of Θ{sub 2} = −90° (the second one). Some possible reasons of such behavior of (CoFeZr){sub x}(CaF{sub 2}){sub (100−x)} nanocomposite films are discussed.

  2. A Coordinated Focused Ion Beam/Ultramicrotomy Technique for Serial Sectioning of Hayabusa Particles and Other Returned Samples

    Science.gov (United States)

    Berger, E. L.; Keller, L. P.

    2014-01-01

    Recent sample return missions, such as NASA's Stardust mission to comet 81P/Wild 2 and JAXA's Hayabusa mission to asteroid 25143 Itokawa, have returned particulate samples (typically 5-50 µm) that pose tremendous challenges to coordinated analysis using a variety of nano- and micro-beam techniques. The ability to glean maximal information from individual particles has become increasingly important and depends critically on how the samples are prepared for analysis. This also holds true for other extraterrestrial materials, including interplanetary dust particles, micrometeorites and lunar regolith grains. Traditionally, particulate samples have been prepared using microtomy techniques (e.g., [1]). However, for hard mineral particles ?20 µm, microtome thin sections are compromised by severe chatter and sample loss. For these difficult samples, we have developed a hybrid technique that combines traditional ultramicrotomy with focused ion beam (FIB) techniques, allowing for the in situ investigation of grain surfaces and interiors. Using this method, we have increased the number of FIB-SEM prepared sections that can be recovered from a particle with dimensions on the order of tens of µms. These sections can be subsequently analyzed using a variety of electron beam techniques. Here, we demonstrate this sample preparation technique on individual lunar regolith grains in order to study their space-weathered surfaces. We plan to extend these efforts to analyses of individual Hayabusa samples.

  3. Stress, microstructure and evolution under ion irradiation in thin films grown by ion beam sputtering: modelling and application to interfacial effects in metallic multilayers; Contraintes, microstructure et sollicitation sous irradiation aux ions de films minces elabores par pulverisation ionique: modelisation et application a l'etude des effets interfaciaux dans des multicouches metalliques

    Energy Technology Data Exchange (ETDEWEB)

    Debelle, A

    2006-09-15

    We have investigated the formation of the interfacial chemical mixing in Mo/Ni multilayers, and particularly the influence of ballistic effects during the growth. For this purpose, hetero-epitaxial b.c.c./f.c.c. Mo(110)/Ni(111) multilayers were grown by two deposition methods: thermal evaporation and direct ion beam sputtering. As a preliminary, an accurate description of the stress state in pure sputtered Mo thin films was required. Microstructural and stress state analyses were essentially carried out by X-ray diffraction, and ion irradiation was used as a powerful tool to control the stress level. We showed that thermal evaporated thin films exhibit a weak tensile growth stress ({approx} 0.6 GPa) that can be accounted for by the grain boundary relaxation model, whereas sputtered thin films develop large compressive growth stress (- 2 to - 4 GPa). This latter results from the bombardment of the growing film by the energetic particles involved during the sputtering process (atomic peening phenomenon), which induces the formation of defects in the layers, generating volume distortions. We thus developed a stress model that includes a hydrostatic stress component to account for these volume strains. This model allowed us to determine the 'unstressed and free of defects lattice parameter' a{sub 0}, solely linked to chemical effects. For epitaxial Mo layers, it was possible to separate coherency stress from growth stress due to their distinct kinetic evolution during ion irradiation. Therefore, the stress analysis enabled us to determine the a{sub 0} values in Mo sub-layers of Mo/Ni superlattices. A tendency to the formation of an interfacial alloy is observed independently of the growth conditions, which suggests that thermodynamic forces favour the exchange mechanism. However, the extent of the intermixing effect is clearly enhanced by ballistic effects. (author)

  4. Characterization of ITO/CdO/glass thin films evaporated by electron beam technique

    Directory of Open Access Journals (Sweden)

    Hussein Abdel-Hafez Mohamed and Hazem Mahmoud Ali

    2008-01-01

    Full Text Available A thin buffer layer of cadmium oxide (CdO was used to enhance the optical and electrical properties of indium tin oxide (ITO films prepared by an electron-beam evaporation technique. The effects of the thickness and heat treatment of the CdO layer on the structural, optical and electrical properties of ITO films were carried out. It was found that the CdO layer with a thickness of 25 nm results in an optimum transmittance of 70% in the visible region and an optimum resistivity of 5.1×10−3 Ω cm at room temperature. The effect of heat treatment on the CdO buffer layer with a thickness of 25 nm was considered to improve the optoelectronic properties of the formed ITO films. With increasing annealing temperature, the crystallinity of ITO films seemed to improve, enhancing some physical properties, such as film transmittance and conductivity. ITO films deposited onto a CdO buffer layer heated at 450 °C showed a maximum transmittance of 91% in the visible and near-infrared regions of the spectrum associated with the highest optical energy gap of 3.61 eV and electrical resistivity of 4.45×10−4 Ω cm at room temperature. Other optical parameters, such as refractive index, extinction coefficient, dielectric constant, dispersion energy, single effective oscillator energy, packing density and free carrier concentration, were also studied.

  5. Fault Diagnosis of Beam-Like Structure Using Modified Fuzzy Technique

    Directory of Open Access Journals (Sweden)

    Dhirendranath Thatoi

    2014-01-01

    Full Text Available This paper presents a novel hybrid fuzzy logic based artificial intelligence (AI technique applicable to diagnosis of the crack parameters in a fixed-fixed beam by using the vibration signatures as input. The presence of damage in engineering structures leads to changes in vibration signatures like natural frequency and mode shapes. In the first part of this work, a structure with a failure crack has been analyzed using finite element method (FEM and retrospective changes in the vibration signatures have been recorded. In the second part of the research work, these deviations in the vibration signatures for the first three mode shapes have been taken as input parameters for a fuzzy logic based controller for calculation of crack location and its severity as output parameters. In the proposed fuzzy controller, hybrid membership functions have been taken. Several fuzzy rules have been identified for prediction of crack depth and location and the results have been compared with finite element analysis. A database of experimental results has also been considered to check the robustness of the fuzzy controller. The results show that predictions for the nondimensional crack location, α, deviate ~2.4% from experimental values and for the nondimensional crack depth, δ, are less than ~−2%.

  6. Cure and mechanical behaviors of cycloaliphatic/DGEBA epoxy blend system using electron-beam technique

    Energy Technology Data Exchange (ETDEWEB)

    Lee, J.R.; Heo, G.Y.; Park, S.J. [Korea Research Institute of Chemical Technology, Taejeon (Korea)

    2002-05-01

    4-Vinyl-1- cyclohexene diepoxide (VCE)/ diglycidyl ether of bisphenol -A(DGEBA) epoxy blends with benzylquinoxalinium hexafluoroanti-monate were cured using an electron-beam technique. the effect of DGEBA content to VCE on cure behavior, thermal stabilities, and mechanical properties was investigated. The composition of VCE/DGEBA blend system varied within 100:0, 80:20, 60:40. 40:60 20:80, and 0:100wt%. The cure behavior and thermal stability of the cured specimens was monited by near-infrared spectroscopy and thermogravimetric analysis, respectively. Also, the critical stress intensity factor (K{sub 1C}) test of the cured specimens was performed to study the mechanical interfacial properties. As a result, the decreases of short side-chide structure and chain scission were observed in NIR measurements as the DGEBA content increases, resulting in varying the hydroxyl and carbonyl groups. And, the initial decomposition temperature (IDT), temperature of maximum weight loss (T{sub max}), and decomposition activation energy (E{sub d}) as thermal stability factors were increased with increasing the DGEBA content. These results could be explained by mean of decreasing viscosity, stable aromatic ring structure, and grafted interpenetrating polymer network with increasing of DGEBA content. Also, the maximum K{sub 1C} value showed at mixing ratio of 40:60 wt% in this blend system. (author). 22 refs., 2 tabs., 6 figs.

  7. Beam Coupling Impedance Localization Technique Validation and Measurements in the CERN Machines

    CERN Document Server

    Biancacci, N; Argyropoulos, T; Bartosik, H; Calaga, R; Cornelis, K; Gilardoni, S; Métral, E; Mounet, N; Papaphilippou, Y; Persichelli, S; Rumolo, G; Salvant, B; Sterbini, G; Tomàs, R; Wasef, R; Migliorati, M; Palumbo, L

    2013-01-01

    The beam coupling impedance could lead to limitations in beam brightness and quality, and therefore it needs accurate quantification and continuous monitoring in order to detect and mitigate high impedance sources. In the CERN machines, for example, kickers and collimators are expected to be important contributors to the total imaginary part of the transverse impedance. In order to detect the other sources, a beam based measurement was developed: from the variation of betatron phase beating with intensity, it is possible to detect the locations of main impedance sources. In this work we present the application of the method with beam measurements in the CERN PS, SPS and LHC.

  8. Generation of Homogeneous and Patterned Electron Beams using a Microlens Array Laser-Shaping Technique

    Energy Technology Data Exchange (ETDEWEB)

    Halavanau, Aliaksei [NICADD, DeKalb; Edstrom, Dean [Fermilab; Gai, Wei [Argonne, HEP; Ha, Gwanghui [Argonne, HEP; Piot, Philippe [NICADD, DeKalb; Power, John [Argonne, HEP; Qiang, Gao [Unlisted, CN; Ruan, Jinhao [Fermilab; Santucci, James [Fermilab; Wisniewski, Eric [Argonne, HEP

    2016-06-01

    In photocathodes the achievable electron-beam parameters are controlled by the laser used to trigger the photoemission process. Non-ideal laser distribution hampers the final beam quality. Laser inhomogeneities, for instance, can be "amplified" by space-charge force and result in fragmented electron beams. To overcome this limitation laser shaping methods are routinely employed. In the present paper we demonstrate the use of simple microlens arrays to dramatically improve the transverse uniformity. We also show that this arrangement can be used to produce transversely-patterned electron beams. Our experiments are carried out at the Argonne Wakefield Accelerator facility.

  9. Development of the Technique for Fabricating Submicron Moiré Gratings on Metal Materials Using Focused Ion Beam Milling

    Institute of Scientific and Technical Information of China (English)

    DU Hua; XIE Hui-Min; GUO Zhi-Qiang; LUO Qiang; GU Chang-Zhi; QIANG Hai-Chang; RONG Li-Jian

    2007-01-01

    A focused gallium ion (Ga+) beam is used to fabricate micro/submicron spacing gratings on the surface of porous NiTi shape memory alloy (SMA). The crossing type of gratings with double-frequency (25001/mm and 50001/mm)using the focused ion beam (FIB) milling are successfully produced in a combination mode or superposition are obtained to study the micro-scale deformation of porous NiTi SMA. The grating fabrication technique is discussed in detail. The experimental results verify the feasibility of fabricating high frequency grating on metal surface using FIB milling.

  10. Statistical signal processing techniques for coherent transversal beam dynamics in synchrotrons

    Energy Technology Data Exchange (ETDEWEB)

    Alhumaidi, Mouhammad

    2015-03-04

    Transversal coherent beam oscillations can occur in synchrotrons directly after injection due to errors in position and angle, which stem from inaccurate injection kicker reactions. Furthermore, the demand for higher beam intensities is always increasing in particle accelerators. The wake fields generated by the traveling particles will be increased by increasing the beam intensity. This leads to a stronger interaction between the beam and the different accelerator components, which increases the potential of coherent instabilities. Thus, undesired beam oscillations will occur when the natural damping is not enough to attenuate the oscillations generated by the coherent beam-accelerator interactions. The instabilities and oscillations can be either in transversal or longitudinal direction. In this work we are concerned with transversal beam oscillations only. In normal operation, transversal beam oscillations are undesired since they lead to beam quality deterioration and emittance blow up caused by the decoherence of the oscillating beam. This decoherence is caused by the tune spread of the beam particles. The emittance blow up reduces the luminosity of the beam, and thus the collision quality. Therefore, beam oscillations must be suppressed in order to maintain high beam quality during acceleration. A powerful way to mitigate coherent instabilities is to employ a feedback system. A Transversal Feedback System (TFS) senses instabilities of the beam by means of Pickups (PUs), and acts back on the beam through actuators, called kickers. In this thesis, a novel concept to use multiple PUs for estimating the beam displacement at the position with 90 phase advance before the kicker is proposed. The estimated values should be the driving feedback signal. The signals from the different PUs are delayed such that they correspond to the same bunch. Subsequently, a weighted sum of the delayed signals is suggested as an estimator of the feedback correction signal. The

  11. A New Technique for Vernier Pointing of a Beam-Waveguide Antenna

    Science.gov (United States)

    Veruttipong, Watt; Bathker, Dan A.

    1994-01-01

    This paper presents a new and simple approach for the Ka-band vernier pointing of a 34m beam-waveguide (BWG) antenna (also applicable to a 70m antenna. In this study, rotation of a BWG flat mirror, located at the elevation axis, is used to scan the beam instead of using the very large tipping structure of the antenna.

  12. Experimental evaluation of a spatial resampling technique to improve the accuracy of pencil-beam dose calculation in proton therapy.

    Science.gov (United States)

    Egashira, Yusuke; Nishio, Teiji; Matsuura, Taeko; Kameoka, Satoru; Uesaka, Mitsuru

    2012-07-01

    In proton therapy, pencil-beam algorithms (PBAs) are the most widely used dose calculation methods. However, the PB calculations that employ one-dimensional density scaling neglect the effects of lateral density heterogeneity on the dose distributions, whereas some particles included in such pencil beams could overextend beyond the interface of the density heterogeneity. We have simplified a pencil-beam redefinition algorithm (PBRA), which was proposed for electron therapy, by a spatial resampling technique toward an application for proton therapy. The purpose of this study is to evaluate the calculation results of the spatial resampling technique in terms of lateral density heterogeneity by comparison with the dose distributions that were measured in heterogeneous slab phantoms. The pencil beams are characterized for multiple residual-range (i.e., proton energy) bins. To simplify the PBRA, the given pencil beams are resampled on one or two transport planes, in which smaller sub-beams that are parallel to each other are generated. We addressed the problem of lateral density heterogeneity comparing the calculation results to the dose distributions measured at different depths in heterogeneous slab phantoms using a two-dimensional detector. Two heterogeneity slab phantoms, namely, phantoms A and B, were designed for the measurements and calculations. In phantom A, the heterogeneity slab was placed close to the surface. On the other hand, in phantom B, it was placed close to the Bragg peak in the mono-energetic proton beam. In measurements, lateral dose profiles showed a dose reduction and increment in the vicinity ofx = 0 mm in both phantoms at depths z = 142 and 161 mm due to lateral particle disequilibrium. In phantom B, these dose reduction/increment effects were higher/lower, respectively, than those in phantom A. This is because a longer distance from the surface to the heterogeneous slab increases the strength of proton scattering. Sub-beams, which were

  13. Polarization beam combination technique for gain saturation effect compensation in high-energy systems

    Science.gov (United States)

    Chen, Junchi; Peng, Yujie; Su, Hongpeng; Leng, Yuxin

    2016-06-01

    To compensate for the gain saturation effect in the high-energy laser amplifier, a modified polarization beam combination (PBC) method is introduced to reshape temporal waveform of the injected laser pulse to obtain a controlled high-energy laser pulse shape after amplification. One linearly polarized beam is divided into two orthogonal polarized beams, which spatially recombine together collinearly after propagating different optical paths with relative time delay in PBC structure. The obtained beam with polarization direction being rotated by the following half wave plate is divided and combined again to reform a new beam in another modified polarization beam structure. The reformed beam is injected into three cascaded laser amplifiers. The amplified pulse shape can be controlled by the incident pulse shape and amplifier gain, which is agreeable to the simulation by the Frank-Nodvik equations. Based on the simple method, the various temporal waveform of output pulse with tunable 7 to 20 ns pulse duration can be obtained without interferometric fringes.

  14. Computer simulation of three-dimensional heavy ion beam trajectory imaging techniques used for magnetic field estimation.

    Science.gov (United States)

    Ling, C; Connor, K A; Demers, D R; Radke, R J; Schoch, P M

    2007-11-01

    A magnetic field mapping technique via heavy ion beam trajectory imaging is being developed on the Madison Symmetric Torus reversed field pinch. This paper describes the computational tools created to model camera images of the light emitted from a simulated ion beam, reconstruct a three-dimensional trajectory, and estimate the accuracy of the reconstruction. First, a computer model is used to create images of the torus interior from any candidate camera location. It is used to explore the visual field of the camera and thus to guide camera parameters and placement. Second, it is shown that a three-dimensional ion beam trajectory can be recovered from a pair of perspectively projected trajectory images. The reconstruction considers effects due to finite beam size, nonuniform beam current density, and image background noise. Third, it is demonstrated that the trajectory reconstructed from camera images can help compute magnetic field profiles, and might be used as an additional constraint to an equilibrium reconstruction code, such as MSTFit.

  15. Invited Article: The coherent optical laser beam recombination technique (COLBERT) spectrometer: Coherent multidimensional spectroscopy made easier

    Science.gov (United States)

    Turner, Daniel B.; Stone, Katherine W.; Gundogdu, Kenan; Nelson, Keith A.

    2011-08-01

    We have developed an efficient spectrometer capable of performing a wide variety of coherent multidimensional measurements at optical wavelengths. The two major components of the largely automated device are a spatial beam shaper which controls the beam geometry and a spatiotemporal pulse shaper which controls the temporal waveform of the femtosecond pulse in each beam. We describe how to construct, calibrate, and operate the device, and we discuss its limitations. We use the exciton states of a semiconductor nanostructure as a working example. A series of complex multidimensional spectra—displayed in amplitude and real parts—reveals increasingly intricate correlations among the excitons.

  16. Four-dimensional transverse beam matrix measurement using the multiple-quadrupole scan technique

    Directory of Open Access Journals (Sweden)

    Eduard Prat

    2014-05-01

    Full Text Available Accurate measurements of the transverse beam properties are essential to understand and optimize particle beams. We present an optimized method that uses three quadrupole magnets and one profile monitor to measure the full 4D transverse matrix of the beam. The method has been applied to the SwissFEL Injector Test Facility (SITF at the Paul Scherrer Institute (Villigen. The SITF is the principal test bed and demonstration plant for the SwissFEL project, which aims at realizing a hard-x-ray free-electron laser in 2017. Simulations, measurements, and results of cross-plane coupling correction are presented.

  17. Development of Focused Ion Beam technique for high speed steel 3D-SEM artefact fabrication

    DEFF Research Database (Denmark)

    Carli, Lorenzo; MacDonald, A. Nicole; De Chiffre, Leonardo

    2009-01-01

    The work describes preliminary manufacture by grinding, followed by machining on a Focused Ion Beam (FIB), of a high speed steel step artefact for 3D-SEM calibration. The FIB is coupled with a SEM in the so called dual beam instrument. The milling capabilities of FIB were checked from a qualitati...... point of view, using the dual beam SEM imaging, and quantitatively using a reference stylus instrument, to establish traceability. A triangular section having a depth of about 10 μm was machined, where the 50 μm curvature radius due to grinding was reduced to about 2 μm by FIB milling...

  18. Nonlinear transmission sputtering

    Science.gov (United States)

    Bitensky, I. S.; Sigmund, P.

    1996-05-01

    General expressions have been derived for the nonlinear yield of transmission sputtering for an incident polyatomic ion under the assumption that the molecule breaks up on entering the target and that sputter yields are enhanced due to proximity of atomic trajectories. Special attention is given to the case of negligible Coulomb explosion where projectile atoms penetrate independently. For weakly overlapping trajectories, the yield enhancement factor of a polyatomic molecule can be expressed by that of a diatom, amended with a correction for triple correlations if necessary. This expression is in good agreement with recent experimental findings on phenylalanine targets. Pertinent results on multiple scattering of atomic ions are reviewed and applied to independently-moving fragment atoms. The merits of measurements at variable layer thickness in addition to variable projectile energy are mentioned.

  19. Combined total body X-ray irradiation and total skin electron beam radiotherapy with an improved technique for mycosis fungoides

    Energy Technology Data Exchange (ETDEWEB)

    Halberg, F.E.; Fu, K.K.; Weaver, K.A.; Zackheim, H.S.; Epstein, E.H. Jr.; Wintroub, B.U.

    1989-08-01

    Twelve consecutive patients with advanced stage mycosis fungoides (MF) were treated with combined total body X ray irradiation (TBI) and total skin electron beam radiotherapy (EBRT). Six had generalized plaque disease and dermatopathic nodes, three had tumor stage disease and node biopsy positive for mycosis fungoides, and three had erythroderma/Sezary syndrome. The treatment regimen consisted of split course total body X ray irradiation, given in twice weekly 15 cGy fractions to 75 cGy, then total skin electron beam radiation therapy given in once weekly 400 cGy fractions to a total dose of 2400 cGy. Underdosed areas and areas of greatest initial involvement were boosted 400 cGy twice weekly for an additional 1200 cGy. This was followed by a second course of total body X ray irradiation, to a total dose of 150 cGy. The total skin electron beam radiotherapy technique is a modification of an established six position EBRT technique for mycosis fungoides. Measurements to characterize the beam with and without a lexan scattering plate, demonstrated that the combination of no-plate beams produced better dose uniformity with a much higher dose rate. This improved technique is particularly advantageous for elderly and/or frail patients. Nine (75%) of the 12 patients achieved complete response (CR). The other three had significant improvement with greater than 80% clearing of their disease and resolution of symptoms. All six patients with generalized plaque disease achieved complete response and remained free of disease from 2 to 16 months. Two of three node positive patients also achieved complete response; one, with massive biopsy-documented mycosis fungoides nodal disease and deep open tumors, remained relapse-free over 2 years. Only one of the three patients with erythroderma/Sezary syndrome achieved a complete response, which was short lived.

  20. Novel imaging and quality assurance techniques for ion beam therapy a Monte Carlo study

    CERN Document Server

    Rinaldi, I; Jäkel, O; Mairani, A; Parodi, K

    2010-01-01

    Ion beams exhibit a finite and well defined range in matter together with an “inverted” depth-dose profile, the so-called Bragg peak. These favourable physical properties may enable superior tumour-dose conformality for high precision radiation therapy. On the other hand, they introduce the issue of sensitivity to range uncertainties in ion beam therapy. Although these uncertainties are typically taken into account when planning the treatment, correct delivery of the intended ion beam range has to be assured to prevent undesired underdosage of the tumour or overdosage of critical structures outside the target volume. Therefore, it is necessary to define dedicated Quality Assurance procedures to enable in-vivo range verification before or during therapeutic irradiation. For these purposes, Monte Carlo transport codes are very useful tools to support the development of novel imaging modalities for ion beam therapy. In the present work, we present calculations performed with the FLUKA Monte Carlo code and pr...

  1. Charge Breeding Techniques in an Electron Beam Ion Trap for High Precision Mass Spectrometry at TITAN

    Science.gov (United States)

    MacDonald, T. D.; Simon, M. C.; Bale, J. C.; Chowdhury, U.; Eibach, M.; Gallant, A. T.; Lennarz, A.; Simon, V. V.; Chaudhuri, A.; Grossheim, A.; Kwiatkowski, A. A.; Schultz, B. E.; Dilling, J.

    2012-10-01

    Penning trap mass spectrometry is the most accurate and precise method available for performing atomic mass measurements. TRIUMF's Ion Trap for Atomic and Nuclear science is currently the only facility to couple its Penning trap to a rare isotope facility and an electron beam ion trap (EBIT). The EBIT is a valuable tool for beam preparation: since the precision scales linearly with the charge state, it takes advantage of the precision gained by using highly charged ions. However, this precision gain is contingent on fast and efficient charge breeding. An optimization algorithm has been developed to identify the optimal conditions for running the EBIT. Taking only the mass number and half-life of the isotope of interest as inputs, the electron beam current density, charge breeding time, charge state, and electron beam energy are all specified to maximize this precision. An overview of the TITAN charge breeding program, and the results of charge breeding simulations will be presented.

  2. The LUPIN detector supporting least intrusive beam monitoring technique through neutron detection

    CERN Document Server

    Manessi, G P; Welsch, C; Caresana, M; Ferrarini, M

    2013-01-01

    The Long interval, Ultra-wide dynamic Pile-up free Neutron rem counter (LUPIN) is a novel detector initially developed for radiation protection purposes, specifically conceived for applications in pulsed neutron fields. The detector has a measurement capability varying over many orders of neutron burst intensity, from a single neutron up to thousands of interactions for each burst, without showing any saturation effect. Whilst LUPIN has been developed for applications in the radiation protection fields, its unique properties make it also well suited to support other beam instrumentation. In this contribution, the design of LUPIN is presented in detail and results from measurements carried out in different facilities summarize its main characteristics. Its potential use as beam loss monitor (BLM) and complementary detector for non-invasive beam monitoring purposes (e.g. to complement a monitor based on proton beam “halo” detection) in medical accelerators is then examined. In the context of its application...

  3. Experimental measurement of a time-varying optical path difference by the small-aperture beam technique

    Science.gov (United States)

    Hugo, Ronald J.; Jumper, Eric J.

    1996-08-01

    We discuss the use of time series of the jitter angle of multiple, small-aperture probe beams (the small-aperture beam technique, or SABT) as they emerge from a turbulent, optically active flow-field to quantify the time-varying optical path difference (OPD). The flow field studied is that for the transitionally turbulent region of a two-dimensional heated jet. Techniques to construct a complete time series of instantaneous realizations of the OPD are first applied to a numerically generated flow field and then to an experimental flow field. The SABT sensor's measurement accuracy is assessed, and its application to flow fields that differ from the numerical heated jet is discussed.

  4. Study of indium tin oxide thin films deposited on acrylics substrates by Ion beam assisted deposition technique

    OpenAIRE

    Meng Lijian; Liang Erjun; Gao Jinsong; Teixeira, Vasco M. P.; Santos, M. P. dos

    2009-01-01

    Indium tin oxide (ITO) thin films have been deposited onto acrylics (PMMA) substrates by ion beam assisted deposition technique at different oxygen flows. The structural, optical and electrical properties of the deposited films have been characterized by X-ray diffraction, transmittance, FTIR, ellipometry and Hall effect measurements. The optical constants of the deposited films have been calculated by fitting the ellipsometric spectra. The effects of the oxygen flow on the properties of the ...

  5. A comparison of TPS and different measurement techniques in small-field electron beams

    Energy Technology Data Exchange (ETDEWEB)

    Donmez Kesen, Nazmiye, E-mail: nazo94@gmail.com; Cakir, Aydin; Okutan, Murat; Bilge, Hatice

    2015-04-01

    In recent years, small-field electron beams have been used for the treatment of superficial lesions, which requires small circular fields. However, when using very small electron fields, some significant dosimetric problems may occur. In this study, dose distributions and outputs of circular fields with dimensions of 5 cm and smaller, for nominal energies of 6, 9, and 15 MeV from the Siemens ONCOR Linac, were measured and compared with data from a treatment planning system using the pencil-beam algorithm in electron beam calculations. All dose distribution measurements were performed using the Gafchromic EBT film; these measurements were compared with data that were obtained from the Computerized Medical Systems (CMS) XiO treatment planning system (TPS), using the gamma-index method in the PTW VeriSoft software program. Output measurements were performed using the Gafchromic EBT film, an Advanced Markus ion chamber, and thermoluminescent dosimetry (TLD). Although the pencil-beam algorithm is used to model electron beams in many clinics, there is no substantial amount of detailed information in the literature about its use. As the field size decreased, the point of maximum dose moved closer to the surface. Output factors were consistent; differences from the values obtained from the TPS were, at maximum, 42% for 6 and 15 MeV and 32% for 9 MeV. When the dose distributions from the TPS were compared with the measurements from the Gafchromic EBT films, it was observed that the results were consistent for 2-cm diameter and larger fields, but the outputs for fields of 1-cm diameter and smaller were not consistent. In CMS XiO TPS, calculated using the pencil-beam algorithm, the dose distributions of electron treatment fields that were created with circular cutout of a 1-cm diameter were not appropriate for patient treatment and the pencil-beam algorithm is not convenient for monitor unit (MU) calculations in electron dosimetry.

  6. Simulation of crystalline beams in storage rings using molecular dynamics technique

    Science.gov (United States)

    Meshkov, I.; Katayama, T.; Sidorin, A.; Smirnov, A.; Syresin, E.; Trubnikov, G.; Tsutsui, H.

    2006-03-01

    Achieving very low temperatures in the beam rest frame can present new possibilities in accelerator physics. Increasing luminosity in the collider and in experiments with targets is a very important asset for investigating rare radioactive isotopes. The ordered state of circulating ion beams was observed at several storage rings: NAP-M [Budker, et al., in: Proceedings of the 4th All-Union Conference on Charged-Particle Accelerators [in Russian], vol. 2, Nauka, Moscow, 1975, p. 309; Budker et al., Part. Accel. 7 (1976) 197; Budker et al., At. Energ. 40 (1976) 49. E. Dementev, N. Dykansky, A. Medvedko et al., Prep. CERN/PS/AA 79-41, Geneva, 1979] (Novosibirsk), ESR [M. Steck et al., Phys. Rev. Lett. 77 (1996) 3803] and SIS [Hasse and Steck, Ordered ion beams, in: Proceeding of EPAC '2000] (Darmstadt), CRYRING [Danared et al., Observation of ordered ion beams in CRYRING, in: Proceeding of PAC '2001] (Stockholm) and PALLAS [Schramm et al., in: J.L. Duggan (Eds.), Proceedings of the Conference on Appl. of Acc. in Research and Industry AIP Conference Proceedings, p. 576 (to be published)] (Munich). In this report, the simulation of 1D crystalline beams with BETACOOL code is presented. The sudden reduction of momentum spread in the ESR experiment is described with this code. Simulation shows good agreement with experimental results and also with the intrabeam scattering (IBS) theory [Martini, Intrabeam scattering in the ACOOL-AA machines, CERN PS/84-9 AA, Geneva, 1984]. The code was used to calculate characteristics of the ordered state of ion beams for the TARN-II [Katayama, TARN II project, in: Proceedings of the IUCF workshop on nuclear physics with stored cooled beams, Spencer, IN, USA, 1984].

  7. Deposition and characterization of titania-silica optical multilayers by asymmetric bipolar pulsed dc sputtering of oxide targets

    Energy Technology Data Exchange (ETDEWEB)

    Sagdeo, P R; Shinde, D D; Misal, J S [Optics and Thin Film Laboratory, Autonagar, BARC-Vizag, Visakhapatnam -530012 (India); Kamble, N M; Tokas, R B; Biswas, A; Poswal, A K; Thakur, S; Bhattacharyya, D; Sahoo, N K; Sabharwal, S C, E-mail: nksahoo@barc.gov.i, E-mail: sahoonk@gmail.co [Spectroscopy Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085 (India)

    2010-02-03

    Titania-silica (TiO{sub 2}/SiO{sub 2}) optical multilayer structures have been conventionally deposited by reactive sputtering of metallic targets. In order to overcome the problems of arcing, target poisoning and low deposition rates encountered there, the application of oxide targets was investigated in this work with asymmetric bipolar pulsed dc magnetron sputtering. In order to evaluate the usefulness of this deposition methodology, an electric field optimized Fabry Perot mirror for He-Cd laser ({lambda} = 441.6 nm) spectroscopy was deposited and characterized. For comparison, this mirror was also deposited by the reactive electron beam (EB) evaporation technique. The mirrors developed by the two complementary techniques were investigated for their microstructural and optical reflection properties invoking atomic force microscopy, ellipsometry, grazing incidence reflectometry and spectrophotometry. From these measurements the layer geometry, optical constants, mass density, topography, surface and interface roughness and disorder parameters were evaluated. The microstructural properties and spectral functional characteristics of the pulsed dc sputtered multilayer mirror were found to be distinctively superior to the EB deposited mirror. The knowledge gathered during this study has been utilized to develop a 21-layer high-pass edge filter for radio photoluminescence dosimetry.

  8. Meso-scale characterization of lithium distribution in lithium-ion batteries using ion beam analysis techniques

    Science.gov (United States)

    Gonzalez-Arrabal, R.; Panizo-Laiz, M.; Fujita, K.; Mima, K.; Yamazaki, A.; Kamiya, T.; Orikasa, Y.; Uchimoto, Y.; Sawada, H.; Okuda, C.; Kato, Y.; Perlado, J. M.

    2015-12-01

    The performance of a Li-ion battery (LIB) is mainly governed by the diffusion capabilities of lithium in the electrodes. Thus, for LIB improvement it is essential to characterize the lithium distribution. Most of the traditionally used techniques for lithium characterization give information about the local scale or in the macroscopic scale. However, the lithium behavior at the local scale is not mirrored at the macroscopic scale. Therefore, the lithium characterization in the mesoscopic scale would be of help to understand and to connect the mechanisms taking place in the two spatial scales. In this paper, we show a general description of the capabilities and limitations of ion beam analysis techniques to study the distributions of lithium and other elements present in the electrodes in the mesoscopic scale. The potential of the 7Li(p,α0)4He nuclear reaction to non-invasively examine the lithium distribution as a function of depth is illustrated. The lithium spatial distribution is characterized using particle induced γ-ray (μ-PIGE) spectroscopy. This technique allows estimating the density of the active particles in the electrode effectively contributing to the Li intercalation and/or de-intercalation. The advantages of the use of ion beam analysis techniques in comparison to more traditional techniques for electrode characterization are discussed.

  9. Exploring the Spatial Resolution of the Photothermal Beam Deflection Technique in the Infrared Region

    CERN Document Server

    Seidel, Wolfgang

    2004-01-01

    In photothermal beam deflection spectroscopy (PTBD) generating and detection of thermal waves occur generally in the sub-millimeter length scale. Therefore, PTBD provides spatial information about the surface of the sample and permits imaging and/or microspectrometry. Recent results of PTBD experiments are presented with a high spatial resolution which is near the diffraction limit of the infrared pump beam (CLIO-FEL). We investigated germanium substrates showing restricted O+-doped regions with an infrared absorption line at a wavelength around 11.6 microns. The spatial resolution was obtained by strongly focusing the probe beam (i.e. a HeNe laser) on a sufficiently small spot. The strong divergence makes it necessary to refocus the probe beam in front of the position detector. The influence of the focusing elements on spatial resolution and signal-to-noise ratio is discussed. In future studies we expect an enhanced spatial resolution due to an extreme focusing of the probe beam leading to a highly sensitive...

  10. Influence of sputtering pressure on the structural, optical and hydrophobic properties of sputtered deposited HfO{sub 2} coatings

    Energy Technology Data Exchange (ETDEWEB)

    Dave, V. [Department of Electrical Engineering, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Dubey, P. [Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Gupta, H.O. [Department of Electrical Engineering, Indian Institute of Technology Roorkee, Roorkee 247667 (India); Chandra, R. [Institute Instrumentation Centre, Indian Institute of Technology Roorkee, Roorkee 247667 (India)

    2013-12-31

    The aim of this work is to develop hydrophobic coatings for outdoor insulators using sputtering technique. Hafnium oxide is characterized by high dielectric constant, large band gap (5.6 eV), high refractive index (2.1) and good mechanical, thermal and chemical properties. Hence HfO{sub 2} is suitable as a protective coating for outdoor insulators used in the transmission line and transformers. Hafnium oxide coatings were deposited on glass substrates by DC magnetron sputtering technique at a sputtering pressure of 5 mTorr, 10 mTorr, 15 mTorr, 20 mTorr and 25 mTorr. The deposited films were characterized by techniques like X-ray diffraction (XRD), atomic force microscopy (AFM), water contact angle goniometry and UV–vis-NIR spectrophotometer. The average crystallite size calculated from XRD peaks shows that it increases with increase in sputtering pressure up to 15 mTorr and then it starts decreasing. The roughness calculated from AFM images shows the similar trend. The deposited films were found to be hydrophobic and transparent. The hydrophobicity of the films was correlated with the roughness calculated from AFM. The effect of sputtering pressure was also investigated on optical band gap and refractive index calculated from transmission and absorption data. The electrical resistivity was found to be high, thus ensuring insulating property of the deposited films. - Highlights: • Outdoor Insulators are suffering from environment pollution problem. • To mitigate problem, hydrophobic coating of HfO{sub 2} was synthesized by DC sputtering. • Effect of sputtering pressure was studied on structural, optical and hydrophobic properties of HfO{sub 2} • Optimum results were obtained at a sputtering pressure of 15 mTorr.

  11. Feasibility of the Spin-Light Polarimetry Technique for Longitudinally Polarized Electron Beams

    Directory of Open Access Journals (Sweden)

    Mohanmurthy Prajwal

    2014-03-01

    Full Text Available A novel polarimeter based on the asymmetry in the spatial distribution of synchrotron radiation (SR will make for a fine addition to the existing Møller and Compton polarimeters. The spin light polarimeter consists of a set of wiggler magnet along the beam that generate synchrotron radiation. The spatial distribution of synchrotron radiation will be measured by ionization chambers. The up-down (below and above the wiggle spatial asymmetry in the transverse plain is used to quantify the polarization of the beam. As a part of the design process, effects of a realistic wiggler magnetic field and an extended beam size were studied. The perturbation introduced by these effects was found to be negligible. Lastly, a full fledged GEANT-4 simulation was built to study the response of the ionization chamber (IC.

  12. A Layer Correlation technique for pion energy calibration at the 2004 ATLAS Combined Beam Test

    CERN Document Server

    INSPIRE-00433248; Abdallah, J.M.; Addy, T.N.; Adragna, P.; Aharrouche, M.; Ahmad, A.; Akesson, T.P.A.; Aleksa, M.; Alexa, C.; Anderson, K.; Andreazza, A.; Anghinolfi, F.; Antonaki, A.; Arabidze, G.; Arik, E.; Atkinson, T.; Baines, J.; Baker, O.K.; Banfi, D.; Baron, S.; Barr, A.J.; Beccherle, R.; Beck, H.P.; Belhorma, B.; Bell, P.J.; Benchekroun, D.; Benjamin, D.P.; Benslama, K.; Bergeaas Kuutmann, E.; Bernabeu, J.; Bertelsen, H.; Binet, S.; Biscarat, C.; Boldea, V.; Bondarenko, V.G.; Boonekamp, M.; Bosman, M.; Bourdarios, C.; Broklova, Z.; Burckhart Chromek, D.; Bychkov, V.; Callahan, J.; Calvet, D.; Canneri, M.; Capeans Garrido, M.; Caprini, M.; Cardiel Sas, L.; Carli, T.; Carminati, L.; Carvalho, J.; Cascella, M.; Castillo, M.V.; Catinaccio, A.; Cauz, D.; Cavalli, D.; Cavalli Sforza, M.; Cavasinni, V.; Cetin, S.A.; Chen, H.; Cherkaoui, R.; Chevalier, L.; Chevallier, F.; Chouridou, S.; Ciobotaru, M.; Citterio, M.; Clark, A.; Cleland, B.; Cobal, M.; Cogneras, E.; Conde Muino, P.; Consonni, M.; Constantinescu, S.; Cornelissen, T.; Correard, S.; Corso Radu, A.; Costa, G.; Costa, M.J.; Costanzo, D.; Cuneo, S.; Cwetanski, P.; Da Silva, D.; Dam, M.; Dameri, M.; Danielsson, H.O.; Dannheim, D.; Darbo, G.; Davidek, T.; De, K.; Defay, P.O.; Dekhissi, B.; Del Peso, J.; Del Prete, T.; Delmastro, M.; Derue, F.; Di Ciaccio, L.; Di Girolamo, B.; Dita, S.; Dittus, F.; Djama, F.; Djobava, T.; Dobos, D.; Dobson, M.; Dolgoshein, B.A.; Dotti, A.; Drake, G.; Drasal, Z.; Dressnandt, N.; Driouchi, C.; Drohan, J.; Ebenstein, W.L.; Eerola, P.; Efthymiopoulos, I.; Egorov, K.; Eifert, T.F.; Einsweiler, K.; El Kacimi, M.; Elsing, M.; Emelyanov, D.; Escobar, C.; Etienvre, A.I.; Fabich, A.; Facius, K.; Fakhr-Edine, A.I.; Fanti, M.; Farbin, A.; Farthouat, P.; Fassouliotis, D.; Fayard, L.; Febbraro, R.; Fedin, O.L.; Fenyuk, A.; Fergusson, D.; Ferrari, P.; Ferrari, R.; Ferreira, B.C.; Ferrer, A.; Ferrere, D.; Filippini, G.; Flick, T.; Fournier, D.; Francavilla, P.; Francis, D.; Froeschl, R.; Froidevaux, D.; Fullana, E.; Gadomski, S.; Gagliardi, G.; Gagnon, P.; Gallas, M.; Gallop, B.J.; Gameiro, S.; Gan, K.K.; Garcia, R.; Garcia, C.; Gavrilenko, I.L.; Gemme, C.; Gerlach, P.; Ghodbane, N.; Giakoumopoulou, V.; Giangiobbe, V.; Giokaris, N.; Glonti, G.; Gottfert, T.; Golling, T.; Gollub, N.; Gomes, A.; Gomez, M.D.; Gonzalez-Sevilla, S.; Goodrick, M.J.; Gorfine, G.; Gorini, B.; Goujdami, D.; Grahn, K.J.; Grenier, P.; Grigalashvili, N.; Grishkevich, Y.; Grosse-Knetter, J.; Gruwe, M.; Guicheney, C.; Gupta, A.; Haeberli, C.; Hartel, R.; Hajduk, Z.; Hakobyan, H.; Hance, M.; Hansen, J.D.; Hansen, P.H.; Hara, K.; Harvey, A., Jr; Hawkings, R.J.; Heinemann, F.E.W.; Henriques Correia, A.; Henss, T.; Hervas, L.; Higon, E.; Hill, J.C.; Hoffman, J.; Hostachy, J.Y.; Hruska, I.; Hubaut, F.; Huegging, F.; Hulsbergen, W.; Hurwitz, M.; Iconomidou-Fayard, L.; Jansen, E.; Jen-La Plante, I.; Johansson, P.D.C.; Jon-And, K.; Joos, M.; Jorgensen, S.; Joseph, J.; Kaczmarska, A.; Kado, M.; Karyukhin, A.; Kataoka, M.; Kayumov, F.; Kazarov, A.; Keener, P.T.; Kekelidze, G.D.; Kerschen, N.; Kersten, S.; Khomich, A.; Khoriauli, G.; Khramov, E.; Khristachev, A.; Khubua, J.; Kittelmann, T.H.; Klingenberg, R.; Klinkby, E.B.; Kodys, P.; Koffas, T.; Kolos, S.; Konovalov, S.P.; Konstantinidis, N.; Kopikov, S.; Korolkov, I.; Kostyukhin, V.; Kovalenko, S.; Kowalski, T.Z.; Kruger, K.; Kramarenko, V.; Kudin, L.G.; Kulchitsky, Y.; Lacasta, C.; Lafaye, R.; Laforge, B.; Lampl, W.; Lanni, F.; Laplace, S.; Lari, T.; Le Bihan, A.C.; Lechowski, M.; Ledroit-Guillon, F.; Lehmann, G.; Leitner, R.; Lelas, D.; Lester, C.G.; Liang, Z.; Lichard, P.; Liebig, W.; Lipniacka, A.; Lokajicek, M.; Louchard, L.; Lourerio, K.F.; Lucotte, A.; Luehring, F.; Lund-Jensen, B.; Lundberg, B.; Ma, H.; Mackeprang, R.; Maio, A.; Maleev, V.P.; Malek, F.; Mandelli, L.; Maneira, J.; Mangin-Brinet, M.; Manousakis, A.; Mapelli, L.; Marques, C.; Marti i Garcia, S.; Martin, F.; Mathes, M.; Mazzanti, M.; McFarlane, K.W.; McPherson, R.; Mchedlidze, G.; Mehlhase, S.; Meirosu, C.; Meng, Z.; Meroni, C.; Mialkovski, V.; Mikulec, B.; Milstead, D.; Minashvili, I.; Mindur, B.; Mitsou, V.A.; Moed, S.; Monnier, E.; Moorhead, G.; Morettini, P.; Morozov, S.V.; Mosidze, M.; Mouraviev, S.V.; Moyse, E.W.J.; Munar, A.; Myagkov, A.; Nadtochi, A.V.; Nakamura, K.; Nechaeva, P.; Negri, A.; Nemecek, S.; Nessi, M.; Nesterov, S.Y.; Newcomer, F.M.; Nikitine, I.; Nikolaev, K.; Nikolic-Audit, I.; Ogren, H.; Oh, S.H.; Oleshko, S.B.; Olszowska, J.; Onofre, A.; Padilla Aranda, C.; Paganis, S.; Pallin, D.; Pantea, D.; Paolone, V.; Parodi, F.; Parsons, J.; Parzhitskiy, S.; Pasqualucci, E.; Passmored, S.M.; Pater, J.; Patrichev, S.; Peez, M.; Perez Reale, V.; Perini, L.; Peshekhonov, V.D.; Petersen, J.; Petersen, T.C.; Petti, R.; Phillips, P.W.; Pina, J.; Pinto, B.; Podlyski, F.; Poggioli, L.; Poppleton, A.; Poveda, J.; Pralavorio, P.; Pribyl, L.; Price, M.J.; Prieur, D.; Puigdengoles, C.; Puzo, P.; Rohne, O.; Ragusa, F.; Rajagopalan, S.; Reeves, K.; Reisinger, I.; Rembser, C.; Bruckman de Renstrom, P.A.; Reznicek, P.; Ridel, M.; Risso, P.; Riu, I.; Robinson, D.; Roda, C.; Roe, S.; Rohne, O.; Romaniouk, A.; Rousseau, D.; Rozanov, A.; Ruiz, A.; Rusakovich, N.; Rust, D.; Ryabov, Y.F.; Ryjov, V.; Salto, O.; Salvachua, B.; Salzburger, A.; Sandaker, H.; Santamarina Rios, C.; Santi, L.; Santoni, C.; Saraiva, J.G.; Sarri, F.; Sauvage, G.; Says, L.P.; Schaefer, M.; Schegelsky, V.A.; Schiavi, C.; Schieck, J.; Schlager, G.; Schlereth, J.; Schmitt, C.; Schultes, J.; Schwemling, P.; Schwindling, J.; Seixas, J.M.; Seliverstov, D.M.; Serin, L.; Sfyrla, A.; Shalanda, N.; Shaw, C.; Shin, T.; Shmeleva, A.; Silva, J.; Simion, S.; Simonyan, M.; Sloper, J.E.; Smirnov, S.Yu; Smirnova, L.; Solans, C.; Solodkov, A.; Solovianov, O.; Soloviev, I.; Sosnovtsev, V.V.; Spano, F.; Speckmayer, P.; Stancu, S.; Stanek, R.; Starchenko, E.; Straessner, A.; Suchkov, S.I.; Suk, M.; Szczygiel, R.; Tarrade, F.; Tartarelli, F.; Tas, P.; Tayalati, Y.; Tegenfeldt, F.; Teuscher, R.; Thioye, M.; Tikhomirov, V.O.; Timmermans, C.J.W.P.; Tisserant, S.; Toczek, B.; Tremblet, L.; Troncon, C.; Tsiareshka, P.; Tyndel, M.; Karagoez Unel, M.; Unal, G.; Unel, G.; Usai, G.; Van Berg, R.; Valero, A.; Valkar, S.; Valls, J.A.; Vandelli, W.; Vannucci, F.; Vartapetian, A.; Vassilakopoulos, V.I.; Vasilyeva, L.; Vazeille, F.; Vernocchi, F.; Vetter-Cole, Y.; Vichou, I.; Vinogradov, V.; Virzi, J.; Vivarelli, I.; de Vivie, J.B.; Volpi, M.; Vu Anh, T.; Wang, C.; Warren, M.; Weber, J.; Weber, M.; Weidberg, A.R.; Weingarten, J.; Wells, P.S.; Werner, P.; Wheeler, S.; Wiessmann, M.; Wilkens, H.; Williams, H.H.; Wingerter-Seez, I.; Yasu, Y.; Zaitsev, A.; Zenin, A.; Zenis, T.; Zenonos, Z.; Zhang, H.; Zhelezko, A.; Zhou, N.

    2011-01-01

    A new method for calibrating the hadron response of a segmented calorimeter is developed and successfully applied to beam test data. It is based on a principal component analysis of the calorimeter layer energy deposits, exploiting longitudinal shower development information to improve the measured energy resolution. Corrections for invisible hadronic energy and energy lost in dead material in front of and between the calorimeters of the ATLAS experiment were calculated with simulated Geant4 Monte Carlo events and used to reconstruct the energy of pions impinging on the calorimeters during the 2004 Barrel Combined Beam Test at the CERN H8 area. For pion beams with energies between 20 and 180 GeV, the particle energy is reconstructed within 3% and the energy resolution is improved by 11% to 25% compared to the response at the electromagnetic scale.

  13. Feasibility of the Spin-Light Polarimetry Technique for Longitudinally Polarized Electron Beams

    CERN Document Server

    Mohanmurthy, Prajwal

    2013-01-01

    A novel polarimeter based on the asymmetry in the spacial distribution of synchrotron radiation will make for a fine addition to the existing M{\\o}ller and Compton polarimeters. The spin light polarimeter consists of a set of wiggler magnet along the beam that generate synchrotron radiation. The spacial distribution of synchrotron radiation will be measured by ionization chambers. The up-down (below and above the wiggle) spacial asymmetry in the transverse plain is used to quantify the polarization of the beam. As a part of the design process, effects of a realistic wiggler magnetic field and an extended beam size were studied. The perturbation introduced by these effects was found to be negligible. Lastly, a full fledged GEANT-4 simulation was built to study the response of the ionization chamber.

  14. Implementation of intra-cavity beam shaping technique to enhance pump efficiency

    CSIR Research Space (South Africa)

    Litvin, IA

    2012-02-01

    Full Text Available of the resonator concept. M1 and M2 are flat mirrors; FPTE and FFTB are the lossless phase transformation elements at mirror M1 and M2 respectively. To solve a given problem we must solve the problem of transforming a Super?Gaussian (SG) beam into FT beam... in the cavity. We consider a system consisting of a lens with focal length f and a lossless phase transformation element ?(r) on the plane of mirror M1 which are positioned as a doublet (see fig. 1) [5]. The field at the focal plane of the lens (mirror M2 (see...

  15. Depth of origin of sputtered atoms: Experimental and theoretical study of Cu/Ru(0001)

    Energy Technology Data Exchange (ETDEWEB)

    Burnett, J.W.; Biersack, J.P.; Gruen, D.M.; Joergensen, B.; Krauss, A.R.; Pellin, M.J.; Schweitzer, E.L.; Yates, J.T. Jr.; Young, C.E.

    1987-01-01

    The depth of origin of sputtered atoms is a subject of considerable interest. The surface sensitivity of analytical techniques such as Secondary Ion Mass Spectrometry (SIMS) and Surface Analysis by Resonance Ionization of Sputtered Atoms (SARISA), and the sputtering properties of strongly segregating alloy systems, are critically dependent on the sputtering depth of origin. A significant discrepancy exists between the predictions of the Sigmund theory and computer sputtering models; in general, the computer models predict a much shallower depth of origin. The existing experimental evidence suggests that most of the sputtered atoms originate in the topmost atomic layer, but until recently, the results have not been definitive. We have experimentally determined the depth of origin of atoms sputtered from surfaces consisting of Cu films of less than two monolayers on a Ru(0001) substrate. The Cu/Ru target was statically sputtered using 3.6 keV Ar/sup +/. The sputtered neutrals were non-resonantly laser ionized and detected using SARISA. The Cu/Ru sputtering yield ratio and the suppression of the Ru sputtering yield were determined for various Cu coverages. The results indicate that the majority of the sputtered atoms originate in the topmost atomic layer. The Cu/Ru system is also modeled using a modified Transport of Ions in Matter (TRIM) code. It was found that TRIM C does not correctly treat the first atomic layer, resulting in a serious underestimate of the number of sputtered atoms which originate in this layer. The corrected version adequately describes the results, predicting that for the experimental conditions roughly two-thirds of the sputtered atoms originate in the first atomic layer. These results are significantly greater than the Sigmund theory estimate of >40%. 26 refs., 3 figs., 1 tab.

  16. Low energy ion beam modification of Cu/Ni/Si(100) surface

    Indian Academy of Sciences (India)

    S K Parida; V R Rmedicherla; D K Mishra; S Choudhary; V Solanki; Shikha Varma

    2014-12-01

    Cu/Ni bilayer has been prepared by thermal evaporation of pure Cu and Ni metals onto Si(100) surface in high vacuum; it was sputtered using argon ion beam in ultra-high vacuum. The ion beam-induced surface and interface modification was investigated using X-ray photoelectron spectroscopy and atomic force microscopy techniques. The deposited sample exhibits the formation of CuO nano-structures of size 40 nm on Cu surface and after sputtering with argon ion beam at a fluence of 5 × 1015 ions/cm2, the surface exhibits a mound structure with an average size of about 100 nm. Interestingly, with sputtering at higher fluence of 2.4 × 1016 ions/cm2, the surface exhibits broad pits of sizes ranging from 100 to 300 nm with an average depth of 10 nm. Bottom surface of these pits contains Ni atoms. The Cu 23/2 peak exhibits a shift of 0.3 eV towards high binding energy and also a large asymmetry of 0.11 after sputtering at high fluence compared with pure copper. These changes are attributed to Cu–Ni interactions at the interface.

  17. Radio-frequency magnetron triode sputtering of cadmium telluride and zinc telluride films and solar cells

    Science.gov (United States)

    Sanford, Adam Lee

    The n-CdS/p-CdTe solar cell has been researched for many years now. Research groups use a variety of processes to fabricate thin-film CdS/CdTe cells, including physical vapor deposition, chemical vapor deposition, and RF diode sputtering. One of the central areas of investigation concerning CdS/CdTe cells is the problem of a Schottky barrier at the back contact. Even cells fabricated with ohmic back contacts degrade into Schottky barriers as the devices are used. This severely degrades power generation. One possible solution is to use p+-ZnTe as an interlayer between CdTe and the back contact. ZnTe is easily doped with Cu to be p-type. However, even contacts with this ZnTe interlayer degrade over time, because Cu is highly mobile and diffuses away from the contact towards the CdS/CdTe junction. Another possibility is to dope ZnTe with N. It has been demonstrated using molecular beam epitaxy and RF diode sputtering. In this study, CdTe films are fabricated using a variation of RF diode sputtering called triode sputtering. This technique allows for control of ion bombardment to the substrate during deposition. Also, a higher plasma density near the target is achieved allowing depositions at lower pressures. These films are characterized structurally to show the effects of the various deposition parameters. N-doped ZnTe films are also fabricated using this technique. These films are characterized electrically to show the effects of the various deposition parameters. Also, the effects of post-deposition annealing are observed. It is found that annealing at the right temperature can increase the conductivity of the films by a factor of 3 or more. However, annealing at higher temperatures decreases the conductivity to as low as 12% of the initial conductivity. Finally, RF triode sputtered N-doped ZnTe films are used as an interlayer at the back contact of a CdS/CdTe solar cell. The effects of annealing the device before and after contact deposition are observed

  18. Adaptive Filter Techniques for Optical Beam Jitter Control and Target Tracking

    Science.gov (United States)

    2008-12-01

    Analysis ......................................................51 5. Standard Deviation of Beam Position Error ...................................51 6...Organization of Analysis ...................................................................51 B. FEEDFORWARD ADAPTIVE FILTERS USING MULTIPLE...actuator (loud speaker or CFSM) before its effect reaches the error sensor. In ANC lingo , y(t) must first pass through the secondary plant dynamics of the

  19. Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

    NARCIS (Netherlands)

    Botman, A.; Mulders, J.J.L.; Hagen, C.W.

    2009-01-01

    The creation of functional nanostructures by electron-beam-induced deposition (EBID) is becoming more widespread. The benefits of the technology include fast ‘point-and-shoot’ creation of three-dimensional nanostructures at predefined locations directly within a scanning electron microscope. One sig

  20. On the accuracy of the finite difference method for applications in beam propagating techniques

    NARCIS (Netherlands)

    Hoekstra, Hugo; Krijnen, Gijsbertus J.M.; Lambeck, Paul

    1992-01-01

    In this paper it is shown that the inaccuracy in the beam propagation method based on the finite difference scheme, introduced by the use of the slowly varying envelope approximation, can be overcome in an effective way. By the introduction of a perturbation expansion the accuracy can be improved as

  1. Anion formation in sputter ion sources by neutral resonant ionization

    Energy Technology Data Exchange (ETDEWEB)

    Vogel, J. S., E-mail: johnsvogel@yahoo.com [University of California, 8300 Feliz Creek Dr., Ukiah, California 95482 (United States)

    2016-02-15

    Focused Cs{sup +} beams in sputter ion sources create mm-diameter pits supporting small plasmas that control anionization efficiencies. Sputtering produces overwhelmingly neutral products that the plasma can ionize as in a charge-change vapor. Electron capture between neutral atoms rises as the inverse square of the difference between the ionization potential of the Cs state and the electron affinity of the sputtered atom, allowing resonant ionization at very low energies. A plasma collision-radiation model followed electronic excitation up to Cs(7d). High modeled Cs(7d) in a 0.5 mm recess explains the 80 μA/mm{sup 2} C{sup −} current density compared to the 20 μA/mm{sup 2} from a 1 mm recess.

  2. Nanocrystalline biphasic resorbable calcium phosphate (HAp/β-TCP) thin film prepared by electron beam evaporation technique

    Energy Technology Data Exchange (ETDEWEB)

    Elayaraja, K.; Chandra, V. Sarath; Joshy, M.I. Ahymah; Suganthi, R.V. [Crystal Growth Centre, Anna University, Chennai 600025, Tamil Nadu (India); Asokan, K. [Inter-University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067 (India); Kalkura, S. Narayana, E-mail: kalkura@yahoo.com [Crystal Growth Centre, Anna University, Chennai 600025, Tamil Nadu (India)

    2013-06-01

    Biphasic calcium phosphate (BCP) thin film having resorbable β-tricalcium phosphate (β-TCP) and non-resorbable hydroxyapatite (HAp) phases having enhanced bioactivity was synthesized by electron beam evaporation technique. Nanosized BCP was deposited as a layer (500 nm) on (0 0 1) silicon substrate by electron beam evaporation and crystalline phase of samples were found to improve on annealing at 700 °C. Uniform deposition of calcium phosphate on silicon substrate was verified from elemental mapping using scanning electron microscope (SEM-EDX). Annealing of the samples led to a decrease in surface roughness, hydrophobicity and dissolution of the coating layer. Amoxicillin loaded thin films exhibited significant bacterial resistance. In addition, BCP thin films did not exhibit any cytotoxicity. Antibiotics incorporated BCP coated implants might prevent the post-surgical infections and could promote bone-bonding of orthopedic devices.

  3. Ion beam induced chemical and morphological changes in TiO{sub 2} films deposited on Si(1 1 1) surface by pulsed laser deposition

    Energy Technology Data Exchange (ETDEWEB)

    Mohanta, R.R. [Department of Chemistry, Krupajal Engineering College, Bhubaneswar 751002 (India); Medicherla, V.R.R., E-mail: mvramarao1@gmail.com [Department of Physics, Institute of Technical Education and Research, Siksha ‘O’ Anusandhan University, Bhubaneswar 751030 (India); Mohanta, K.L. [Department of Physics, Institute of Technical Education and Research, Siksha ‘O’ Anusandhan University, Bhubaneswar 751030 (India); Nayak, Nimai C. [Department of Chemistry, Institute of Technical Education and Research, Siksha ‘O’ Anusandhan University, Bhubaneswar 751030 (India); Majumder, S.; Solanki, V.; Varma, Shikha [Institute of Physics, Sachivalaya Marg, Bhubaneswar 751005 (India); Bapna, Komal; Phase, D.M.; Sathe, V. [UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452017 (India)

    2015-01-15

    Highlights: • Pulsed laser deposition of TiO{sub 2} films on Si(1 1 1) surface. • XPS and AFM study of TiO{sub 2} surface. • Ion beam treatment induced morphology. • Chemical reduction of TiO{sub 2} on the surface. • A-ray induced Auger transition of Ti LMM. - Abstract: We have investigated TiO{sub 2} films prepared by pulsed laser deposition method on Si(1 1 1) surface using X-ray diffraction (XRD), Raman Spectroscopy, X-ray Photoelectron Spectroscopy (XPS), Atomic Force Microscopy (AFM) and ion beam sputtering techniques. Our XRD data along with Raman indicated that the deposited TiO{sub 2} is in anatase phase. The binding energy position of Ti 2p also supports the anatase phase formation. AFM topography of as deposited film indicates the formation of non uniform TiO{sub 2} growth with the formation of voids on Si(1 1 1) substrate. After sputtering with argon ion beam, surface erosion occurs and voids have disappeared. The Ti 2p core level of sputtered TiO{sub 2} exhibits the formation of Ti{sub 2}O{sub 3}, TiO and pure Ti on the surface. High binding energy shoulder of O 1s peak becomes sharp after sputtering. Ti LMM Auger peaks become broader after sputtering but no shift in kinetic energy is observed.

  4. Validation of a deformable image registration technique for cone beam CT-based dose verification

    Energy Technology Data Exchange (ETDEWEB)

    Moteabbed, M., E-mail: mmoteabbed@partners.org; Sharp, G. C.; Wang, Y.; Trofimov, A.; Efstathiou, J. A.; Lu, H.-M. [Massachusetts General Hospital, Boston, Massachusetts 02114 and Harvard Medical School, Boston, Massachusetts 02115 (United States)

    2015-01-15

    Purpose: As radiation therapy evolves toward more adaptive techniques, image guidance plays an increasingly important role, not only in patient setup but also in monitoring the delivered dose and adapting the treatment to patient changes. This study aimed to validate a method for evaluation of delivered intensity modulated radiotherapy (IMRT) dose based on multimodal deformable image registration (DIR) for prostate treatments. Methods: A pelvic phantom was scanned with CT and cone-beam computed tomography (CBCT). Both images were digitally deformed using two realistic patient-based deformation fields. The original CT was then registered to the deformed CBCT resulting in a secondary deformed CT. The registration quality was assessed as the ability of the DIR method to recover the artificially induced deformations. The primary and secondary deformed CT images as well as vector fields were compared to evaluate the efficacy of the registration method and it’s suitability to be used for dose calculation. PLASTIMATCH, a free and open source software was used for deformable image registration. A B-spline algorithm with optimized parameters was used to achieve the best registration quality. Geometric image evaluation was performed through voxel-based Hounsfield unit (HU) and vector field comparison. For dosimetric evaluation, IMRT treatment plans were created and optimized on the original CT image and recomputed on the two warped images to be compared. The dose volume histograms were compared for the warped structures that were identical in both warped images. This procedure was repeated for the phantom with full, half full, and empty bladder. Results: The results indicated mean HU differences of up to 120 between registered and ground-truth deformed CT images. However, when the CBCT intensities were calibrated using a region of interest (ROI)-based calibration curve, these differences were reduced by up to 60%. Similarly, the mean differences in average vector field

  5. Sputtering in supported cluster arrays

    Energy Technology Data Exchange (ETDEWEB)

    Jiménez-Sáez, J.C., E-mail: jc.jimenez@upm.es [Dept. Física Aplicada a la Ingeniería Aeronáutica y Naval, ETSIAE, Universidad Politécnica de Madrid (UPM), 28040 Madrid (Spain); Pérez-Martín, A.M.C.; Jiménez-Rodríguez, J.J. [Dept. Física Aplicada III, Facultad de Ciencias Físicas, Universidad Complutense de Madrid (UCM), 28040 Madrid (Spain)

    2015-06-01

    Bombardment of periodical arrays formed by Co nanoislands deposited on a Cu(0 0 1) substrate with 1-keV argon ions is simulated by using molecular dynamics. Sputtering yield is analyzed distinguishing between particles sputtered across the supported cluster surface and across the flat substrate surface without nanoparticle above. The dependence of this magnitude on the height and the periodical spacing between nanoislands has been investigated. Results show that this dependence for the sputtering across the nanoislands and across the substrate is different. In the case of the total sputtering, the “substrate” effect prevails since the behavior of this magnitude is approximately analogous to the sputtering across the substrate. The more probable causes are analyzed in this article.

  6. Conventional and conformal technique of external beam radiotherapy in locally advanced cervical cancer: Dose distribution, tumor response, and side effects

    Science.gov (United States)

    Mutrikah, N.; Winarno, H.; Amalia, T.; Djakaria, M.

    2017-08-01

    The objective of this study was to compare conventional and conformal techniques of external beam radiotherapy (EBRT) in terms of the dose distribution, tumor response, and side effects in the treatment of locally advanced cervical cancer patients. A retrospective cohort study was conducted on cervical cancer patients who underwent EBRT before brachytherapy in the Radiotherapy Department of Cipto Mangunkusumo Hospital. The prescribed dose distribution, tumor response, and acute side effects of EBRT using conventional and conformal techniques were investigated. In total, 51 patients who underwent EBRT using conventional techniques (25 cases using Cobalt-60 and 26 cases using a linear accelerator (LINAC)) and 29 patients who underwent EBRT using conformal techniques were included in the study. The distribution of the prescribed dose in the target had an impact on the patient’s final response to EBRT. The complete response rate of patients to conformal techniques was significantly greater (58%) than that of patients to conventional techniques (42%). No severe acute local side effects were seen in any of the patients (Radiation Therapy Oncology Group (RTOG) grades 3-4). The distribution of the dose and volume to the gastrointestinal tract affected the proportion of mild acute side effects (RTOG grades 1-2). The urinary bladder was significantly greater using conventional techniques (Cobalt-60/LINAC) than using conformal techniques at 72% and 78% compared to 28% and 22%, respectively. The use of conformal techniques in pelvic radiation therapy is suggested in radiotherapy centers with CT simulators and 3D Radiotherapy Treatment Planning Systems (RTPSs) to decrease some uncertainties in radiotherapy planning. The use of AP/PA pelvic radiation techniques with Cobalt-60 should be limited in body thicknesses equal to or less than 18 cm. When using conformal techniques, delineation should be applied in the small bowel, as it is considered a critical organ according to RTOG

  7. Electronic sputtering of LiF, CaF2, LaF3 and UF4 with 197 MeV Au ions. Is the stoichiometry of atom emission preserved?

    Science.gov (United States)

    Toulemonde, M.; Assmann, W.; Muller, D.; Trautmann, C.

    2017-09-01

    Sputtering experiments with swift heavy ions in the electronic energy loss regime were performed by using the catcher technique in combination with elastic recoil detection analysis. Four different fluoride targets, LiF, CaF2, LaF3 and UF4 were irradiated in the electronic energy loss regime using 197 MeV Au ions. The angular distribution of particles sputtered from the surface of freshly cleaved LiF and CaF2 single crystals is composed of a broad cosine distribution superimposed by a jet-like peak that appears perpendicular to the surface independent of the angle of beam incidence. For LiF, the particle emission in the entire angular distribution (jet plus broad cosine component) is stoichiometric, whereas for CaF2 the ratio of the sputtered F to Ca particles is at large angles by a factor of two smaller than the stoichiometry of the crystal. For single crystalline LaF3 no jet component is observed and the angular distribution is non-stoichiometric with the number of sputtered F particles being slightly larger than the number of sputtered La particles. In the case of UF4, the target was polycrystalline and had a much rougher surface compared to cleaved crystals. This destroys the appearance of a possible jet component leading to a broad angular distribution. The ratio of sputtered U atoms compared to F atoms is in the order of 1-2, i.e. the number of collected particles on the catcher is also non-stoichiometric. Such unlike behavior of particles sputtered from different fluoride crystals creates new questions.

  8. Development of the techniques for food processing with low-energy electron beam

    Energy Technology Data Exchange (ETDEWEB)

    Todoroki, Setsuko; Hayashi, Toru [National Food Research Inst., Tsukuba, Ibaraki (Japan)

    1999-02-01

    This study aimed to construct a new electron beam irradiation apparatus which allows to perform homogeneous irradiation up to a certain depth of a spherical or granular material through rotating it. And the sterilizing effects of this apparatus on various kinds of spices such as black and white peppers (grains), turmeric (root), coriander (seed), basil (leaves) were investigated to compare with the effects of {gamma}-ray irradiation. Electron beam irradiation was made changing the energy form 200 keV for 15 min to 500 keV for 5 min and a dose-depth curve was drawn for each electron energy. Indicator balls were used to examine the radiation effects. It became possible to make homogeneous irradiation onto a spherical surface of food by using the rotary system of the apparatus. It was demonstrated that satisfactory sterilizing effects as much as those of {gamma}-ray were obtainable by superficial treatments with low-energy electron. (M.N.)

  9. Characterization of acoustic effects on flame structures by beam deflection technique

    Energy Technology Data Exchange (ETDEWEB)

    Bedat, B.; Kostiuk, L.W.; Cheng, R.K.

    1993-10-01

    This work shows that the acoustic effects are the causes of the small amplitude flame wrinkling and movements seen in all the different gravitational conditions. The comparison between the acoustic velocity and beam deflection spectra for the two conditions studied (glass beads and fiber glass) demonstrates clearly this flame/acoustic coupling. This acoustic study shows that the burner behaves like a Helmholtz resonator. The estimated resonance frequency corresponds well to the experimental measurements. The fiber glass damps the level of the resonance frequency and the flame motion. The changes shown in normalized beam deflection spectra give further support of this damping. This work demonstrates that the acoustics has a direct influence on flame structure in the laminar case and the preliminary results in turbulent case also show a strong coupling. The nature of this flame/acoustic coupling are still not well understood. Further investigation should include determining the frequency limits and the sensitivity of the flame to acoustic perturbations.

  10. Quantification of SOFC anode microstructure based on dual beam FIB-SEM technique

    Energy Technology Data Exchange (ETDEWEB)

    Iwai, Hiroshi; Kishimoto, Masashi; Hayashi, Daisuke; Saito, Motohiro; Yoshida, Hideo [Department of Aeronautics and Astronautics, Kyoto University, Sakyo-ku, Kyoto 606-8501 (Japan); Shikazono, Naoki; Teshima, Hisanori; Matsuzaki, Katsuhisa; Kanno, Daisuke; Kasagi, Nobuhide [Department of Mechanical Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo-ku, Tokyo 113-8656 (Japan); Matsui, Toshiaki; Kishida, Ryo; Muroyama, Hiroki; Eguchi, Koichi [Department of Energy and Hydrocarbon Chemistry, Kyoto University, Nishikyo-ku, Kyoto 615-8510 (Japan)

    2010-02-15

    The three-dimensional microstructure of an SOFC anode is quantified using a dual beam focused ion beam scanning electron microscopy (FIB-SEM) system equipped with an energy dispersive X-ray spectroscopy (EDX) unit. The microstructure of the Ni-YSZ anode is virtually reconstructed in a computational field using a series of acquired two-dimensional SEM images. The three-phase boundary (TPB) density and tortuosity factors are carefully evaluated by applying two different evaluation methods to each parameter. The TPB density is estimated by a volume expansion method and a centroid method, while the tortuosity factors are evaluated by a random walk calculation and a lattice Boltzmann method (LBM). Estimates of each parameter obtained by the two methods are in good agreement with each other, thereby validating the reliability of the analysis methods proposed in this study. (author)

  11. Laser Pencil Beam Based Techniques for Visualization and Analysis of Interfaces Between Media

    Science.gov (United States)

    Adamovsky, Grigory; Giles, Sammie, Jr.

    1998-01-01

    Traditional optical methods that include interferometry, Schlieren, and shadowgraphy have been used successfully for visualization and evaluation of various media. Aerodynamics and hydrodynamics are major fields where these methods have been applied. However, these methods have such major drawbacks as a relatively low power density and suppression of the secondary order phenomena. A novel method introduced at NASA Lewis Research Center minimizes disadvantages of the "classical" methods. The method involves a narrow pencil-like beam that penetrates a medium of interest. The paper describes the laser pencil beam flow visualization methods in detail. Various system configurations are presented. The paper also discusses interfaces between media in general terms and provides examples of interfaces.

  12. Measurements and Modelling of Sputtering Rates with Low Energy Ions

    Science.gov (United States)

    Ruzic, David N.; Smith, Preston C.; Turkot, Robert B., Jr.

    1996-10-01

    The angular-resolved sputtering yield of Be by D+, and Al by Ar+ was predicted and then measured. A 50 to 1000 eV ion beam from a Colutron was focused on to commercial grade and magnetron target grade samples. The S-65 C grade beryllium samples were supplied by Brush Wellman and the Al samples from TOSOH SMD. In our vacuum chamber the samples can be exposed to a dc D or Ar plasma to remove oxide, load the surface and more-nearly simulate steady state operating conditions in the plasma device. The angular distribution of the sputtered atoms was measured by collection on a single crystal graphite witness plate. The areal density of Be or Al (and BeO2 or Al2O3, after exposure to air) was then measured using a Scanning Auger Spectrometer. Total yield was also measured by deposition onto a quartz crystal oscillator simultaneously to deposition onto the witness plate. A three dimensional version of vectorized fractal TRIM (VFTRIM3D), a Monte-Carlo computer code which includes surface roughness characterized by fractal geometry, was used to predict the angular distribution of the sputtered particles and a global sputtering coefficient. Over a million trajectories were simulated for each incident angle to determine the azimuthal and polar angle distributions of the sputtered atoms. The experimental results match closely with the simulations for total yield, while the measured angular distributions depart somewhat from the predicted cosine curve.

  13. Application of beam deconvolution technique to power spectrum estimation for CMB measurements

    CERN Document Server

    Keihänen, Elina; Kurki-Suonio, Hannu; Reinecke, Martin

    2016-01-01

    We present two novel methods for the estimation of the angular power spectrum of cosmic microwave background (CMB) anisotropies. We assume an absolute CMB experiment with arbitrary asymmetric beams and arbitrary sky coverage. The methods differ from earlier ones in that the power spectrum is estimated directly from time-ordered data, without first compressing the data into a sky map, and they take into account the effect of asymmetric beams. In particular, they correct the beam-induced leakage from temperature to polarization. The methods are applicable to a case where part of the sky has been masked out to remove foreground contamination, leaving a pure CMB signal, but incomplete sky coverage. The first method (DQML) is derived as the optimal quadratic estimator, which simultaneously yields an unbiased spectrum estimate, and minimizes its variance. We successfully apply it to multipoles up to $\\ell$=200. The second method is derived as an weak-signal approximation from the first one. It yields an unbiased es...

  14. Application of the Time of Flight Technique for Lifetime Measurements with Relativistic Beams of Heavy Nuclei

    CERN Document Server

    Chester, A; Bazin, D; Becerril, A; Campbell, C M; Cook, J M; Dewald, A; Dinca, D C; Miller, D; Moeller, V; Müller, W F; Norris, R P; Portillo, M; Starosta, K; Stolz, A; Terry, J R; Vaman, C; Zwahlen, H

    2006-01-01

    A novel method for picosecond lifetime measurements of excited gamma-ray emitting nuclear states has been developed for fast beams from fragmentation reactions. A test measurement was carried out with a beam of 124Xe at an energy of ~55 MeV/u. The beam ions were Coulomb excited to the first 2+ state on a movable target. Excited nuclei emerged from the target and decayed in flight after a distance related to the lifetime. A stationary degrader positioned downstream with respect to the target was used to further reduce the velocity of the excited nuclei. As a consequence, the gamma-ray decays from the 2+ excited state that occurred before or after traversing the degrader were measured at a different Doppler shift. The gamma-ray spectra were analyzed from the forward ring of the Segmented Germanium Array; this ring positioned at 37 deg. simultaneously provides the largest sensitivity to changes in velocity and the best energy resolution. The ratio of intensities in the peaks at different Doppler shifts gives inf...

  15. A new volumetric CT machine for dental imaging based on the cone-beam technique: preliminary results

    Energy Technology Data Exchange (ETDEWEB)

    Mozzo, P. [Dept. of Medical Physics, University Hospital, Verona (Italy); Procacci, C.; Tacconi, A.; Tinazzi Martini, P.; Bergamo Andreis, I.A. [Dept. of Radiology, University Hospital, Verona (Italy)

    1998-12-01

    The objective of this paper is to present a new type of volumetric CT which uses the cone-beam technique instead of traditional fan-beam technique. The machine is dedicated to the dento-maxillo-facial imaging, particularly for planning in the field of implantology. The main characteristics of the unit are presented with reference to the technical parameters as well as the software performance. Images obtained are reported as various 2D sections of a volume reconstruction. Also, measurements of the geometric accuracy and the radiation dose absorbed by the patient are obtained using specific phantoms. Absorbed dose is compared with that given off by spiral CT. Geometric accuracy, evaluated with reference to various reconstruction modalities and different spatial orientations, is 0.8-1 % for width measurements and 2.2 % for height measurements. Radiation dose absorbed during the scan shows different profiles in central and peripheral axes. As regards the maximum value of the central profile, dose from the new unit is approximately one sixth that of traditional spiral CT. The new system appears to be very promising in dento-maxillo-facial imaging and, due to the good ratio between performance and low cost, together with low radiation dose, very interesting in view of large-scale use of the CT technique in such diagnostic applications. (orig.) With 10 figs., 3 tabs., 15 refs.

  16. Synthesis of dynamic phase profile by the correlation technique for spatial control of optical beams in multiplexing and switching

    Science.gov (United States)

    Bugaychuk, Svitlana A.; Gnatovskyy, Vladimir O.; Sidorenko, Andrey V.; Pryadko, Igor I.; Negriyko, Anatoliy M.

    2015-11-01

    New approach for the correlation technique, which is based on multiple periodic structures to create a controllable angular spectrum, is proposed and investigated both theoretically and experimentally. The transformation of an initial laser beam occurs due to the actions of consecutive phase periodic structures, which may differ by their parameters. Then, after the Fourier transformation of a complex diffraction field, the output diffraction orders will be changed both by their intensities and by their spatial position. The controllable change of output angular spectrum is carried out by a simple control of the parameters of the periodic structures. We investigate several simple examples of such management.

  17. Dynamic characterization, monitoring and control of rotating flexible beam-mass structures via piezo-embedded techniques

    Science.gov (United States)

    Lai, Steven H.-Y.

    1992-01-01

    A variational principle and a finite element discretization technique were used to derive the dynamic equations for a high speed rotating flexible beam-mass system embedded with piezo-electric materials. The dynamic equation thus obtained allows the development of finite element models which accommodate both the original structural element and the piezoelectric element. The solutions of finite element models provide system dynamics needed to design a sensing system. The characterization of gyroscopic effect and damping capacity of smart rotating devices are addressed. Several simulation examples are presented to validate the analytical solution.

  18. Research on the Adsorption of Methylene Blue with Rice Husk Ash Aided by Ion Beam Etching Technique

    Institute of Scientific and Technical Information of China (English)

    2011-01-01

    [Objective] The aim was to study the mechanism of the removal effect of methylene blue(MB) by rice husk ash(RHA).[Method] The effects of contact time and pH on the adsorption of MB by rice husk ash were investigated,and the mechanism was discussed.[Result] RHA exhibited a remarkable ability on the adsorption of MB.The process of adsorption reached the equilibrium after 30 min,at about pH 9.The adsorption effect was explored with the aid of ion beam etching technique,which displayed that there were two main ...

  19. Experimental measurement of a time-varying optical path difference using the small-aperture beam technique

    Science.gov (United States)

    Hugo, Ronald J.; Jumper, Eric J.

    1993-12-01

    This paper discusses the use of time series of the jitter angle of multiple, small-aperture probe beams as they emerge from a turbulent, optically-active flow field to quantify the time-varying optical path difference (OPD). Techniques to reconstruct a complete time series of instantaneous realizations of the OPD are first applied to a numerically-generated flow field and then to an experimental flow field. The flow field studied was that for the transitionally- turbulent region of a heated, two-dimensional jet. From these OPD histories spatial and temporal frequencies characterizing the OPD's are extracted. The relevance of these results to adaptive-optic devices is discussed.

  20. Application of magnetron sputtering for producing bioactive ceramic coatings on implant materials

    Indian Academy of Sciences (India)

    J Z Shi; C Z Chen; H J Yu; S J Zhang

    2008-11-01

    Radio frequency (RF) magnetron sputtering is a versatile deposition technique that can produce thin, uniform, dense calcium phosphate coatings. In this paper, principle and character of magnetron sputtering is introduced, and development of the hydroxyapatite and its composite coatings application is reviewed. In addition, influence of heat treatment on magnetron sputtered coatings is discussed. The heat treated coatings have been shown to exhibit bioactive behaviour both in vivo and in vitro. At last, the future application of the bioactive ceramic coating deposited by magnetron sputtering is mentioned.

  1. Pulsed and monoenergetic beams for neutron cross-section measurements using activation and scattering techniques at Triangle Universities Nuclear Laboratory

    Science.gov (United States)

    Hutcheson, A.; Angell, C. T.; Becker, J. A.; Boswell, M.; Crowell, A. S.; Dashdorj, D.; Fallin, B.; Fotiades, N.; Howell, C. R.; Karwowski, H. J.; Kelley, J. H.; Kiser, M.; Macri, R. A.; Nelson, R. O.; Pedroni, R. S.; Tonchev, A. P.; Tornow, W.; Vieira, D. J.; Weisel, G. J.; Wilhelmy, J. B.

    2007-08-01

    In support of the Stewardship Science Academic Alliances initiative, an experimental program has been developed at Triangle Universities Nuclear Laboratory (TUNL) to measure (n,xn) cross-sections with both in-beam and activation techniques with the goal of improving the partial cross-section database for the NNSA Stockpile Stewardship Program. First experimental efforts include excitation function measurements on 235,238U and 241Am using pulsed and monoenergetic neutron beams with En = 5-15 MeV. Neutron-induced partial cross-sections were measured by detecting prompt γ rays from the residual nuclei using various combinations of clover and planar HPGe detectors in the TUNL shielded neutron source area. Complimentary activation measurements using DC neutron beams have also been performed in open geometry in our second target area. The neutron-induced activities were measured in the TUNL low-background counting area. In this presentation, we include detailed information about the irradiation procedures and facilities and preliminary data on first measurements using this capability.

  2. Pulsed and monoenergetic beams for neutron cross-section measurements using activation and scattering techniques at Triangle Universities Nuclear Laboratory

    Energy Technology Data Exchange (ETDEWEB)

    Hutcheson, A. [Triangle Universities Nuclear Laboratory, P.O. Box 90308, Durham, NC 27708 (United States)]. E-mail: hutch@tunl.duke.edu; Angell, C.T. [Triangle Universities Nuclear Laboratory, P.O. Box 90308, Durham, NC 27708 (United States); Becker, J.A. [Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550 (United States); Boswell, M. [Triangle Universities Nuclear Laboratory, P.O. Box 90308, Durham, NC 27708 (United States); Crowell, A.S. [Triangle Universities Nuclear Laboratory, P.O. Box 90308, Durham, NC 27708 (United States); Dashdorj, D. [Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550 (United States); Fallin, B. [Triangle Universities Nuclear Laboratory, P.O. Box 90308, Durham, NC 27708 (United States); Fotiades, N. [Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, NM 87545 (United States); Howell, C.R.; Karwowski, H.J.; Kelley, J.H.; Kiser, M. [Triangle Universities Nuclear Laboratory, P.O. Box 90308, Durham, NC 27708 (United States); Macri, R.A. [Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550 (United States); Nelson, R.O. [Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, NM 87545 (United States); Pedroni, R.S. [NC A and T State University, 1601 East Market Street, Greensboro, NC 27411 (United States); Tonchev, A.P.; Tornow, W. [Triangle Universities Nuclear Laboratory, P.O. Box 90308, Durham, NC 27708 (United States); Vieira, D.J. [Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, NM 87545 (United States); Weisel, G.J. [Penn State Altoona, 3000 Ivyside Park, Altoona, PA 16601 (United States); Wilhelmy, J.B. [Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, NM 87545 (United States)

    2007-08-15

    In support of the Stewardship Science Academic Alliances initiative, an experimental program has been developed at Triangle Universities Nuclear Laboratory (TUNL) to measure (n,xn) cross-sections with both in-beam and activation techniques with the goal of improving the partial cross-section database for the NNSA Stockpile Stewardship Program. First experimental efforts include excitation function measurements on {sup 235,238}U and {sup 241}Am using pulsed and monoenergetic neutron beams with E {sub n} = 5-15 MeV. Neutron-induced partial cross-sections were measured by detecting prompt {gamma} rays from the residual nuclei using various combinations of clover and planar HPGe detectors in the TUNL shielded neutron source area. Complimentary activation measurements using DC neutron beams have also been performed in open geometry in our second target area. The neutron-induced activities were measured in the TUNL low-background counting area. In this presentation, we include detailed information about the irradiation procedures and facilities and preliminary data on first measurements using this capability.

  3. Assembling of a low energy ion beam analysis facility and use of Nuclear Microprobe techniques in geological studies

    Energy Technology Data Exchange (ETDEWEB)

    Utui, R.

    1996-11-01

    In this work, both PIXE and ion beam induced luminescence, or just Ionoluminescence (IL) were used for geochemical studies. The possibility of rapid absolute quantification of elements in the ppm level by PIXE combined with the yet higher sensitivity of IL to transition metals and Rare Earth Elements (REE) activators, in the absence of quenching phenomena, allow for a synergic use of the two methods in geological applications with enhanced sensitivity. IL and PIXE were combined for studying REE distribution in apatite minerals and ion beam induced damage in inorganic material in general with emphasis to synthetically grown zircon crystals doped with REE. Due to the sensitivity of IL to changes in chemical bonding in the material, beam damage effects can be studied even at low integrated doses, through wavelength shift or fading of the induced light. Micro PIXE technique was used for studying profile concentrations of trace elements in pyrite grains and of elements used as geothermometers. Geothermometry allowed to assess the cooling rates in iron meteorites and the mineralization conditions in metamorphic rocks, attempting to describe the tectonic history of the terranes, with application in petrologic studies and geological prospecting. 148 refs.

  4. Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering

    CERN Document Server

    Ellmer, K; Weiss, V; Rossner, H

    2001-01-01

    A novel method is described for the in situ-investigation of nucleation and growth of thin films during magnetron sputtering. Energy dispersive X-ray diffraction with synchrotron light is used for the structural analysis during film growth. An in situ-magnetron sputtering chamber was constructed and installed at a synchrotron radiation beam line with a bending magnet. The white synchrotron light (1-70 keV) passes the sputtering chamber through Kapton windows and hits one of the substrates on a four-fold sample holder. The diffracted beam, observed under a fixed diffraction angle between 3 deg. and 10 deg., is energy analyzed by a high purity Ge-detector. The in situ-EDXRD setup is demonstrated for the growth of tin-doped indium oxide (ITO) films prepared by reactive magnetron sputtering from a metallic target.

  5. Ferromagnetic anisotropy of carbon-doped ZnO nanoneedles fabricated by ion beam technique

    Energy Technology Data Exchange (ETDEWEB)

    Wei, C.S. [Department of Applied Physics, Hong Kong Polytechnic University, Hung Hom, Kowloon (Hong Kong); Lau, S.P., E-mail: apsplau@polyu.edu.hk [Department of Applied Physics, Hong Kong Polytechnic University, Hung Hom, Kowloon (Hong Kong); Tanemura, M.; Subramanian, M.; Akaike, Y. [Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan)

    2012-05-01

    Carbon-doped ZnO (ZnO:C) nanoneedles were fabricated using ion beam irradiation with a simultaneous supply of carbon at room temperature. The structure and the magnetic properties of the ZnO:C nanoneedles were investigated. Hysteresis loops and zero-field cooling (ZFC) and field cooling (FC) curves demonstrated the ferromagnetic properties of the ZnO:C nanoneedles. The Curie temperature of the ZnO:C is above 330 K. The ferromagnetic anisotropy with an easy axis perpendicular to the shape axis of the ZnO:C nanoneedles was observed due to the dipole-dipole magnetic interaction amongst nanoneedles.

  6. Techniques based on genetic algorithms for large deflection analysis of beams

    Indian Academy of Sciences (India)

    Rajesh Kumar; L S Ramachandra; D Roy

    2004-12-01

    A couple of non-convex search strategies, based on the genetic algorithm, are suggested and numerically explored in the context of large-deflection analysis of planar, elastic beams. The first of these strategies is based on the stationarity of the energy functional in the equilibrium state and may therefore be considered weak. The second approach, on the other hand, attempts to directly solve the governing differential equation within an optimisation framework and such a solution may be thought of as strong. Several numerical illustrations and verifications with ‘exact’ solutions, if available, are provided.

  7. Extension of the Finite Integration Technique including dynamic mesh refinement and its application to self-consistent beam dynamics simulations

    Directory of Open Access Journals (Sweden)

    Sascha M. Schnepp

    2012-01-01

    Full Text Available An extension of the framework of the Finite Integration Technique (FIT including dynamic and adaptive mesh refinement is presented. After recalling the standard formulation of the FIT, the proposed mesh adaptation procedure is described. Besides the linear interpolation approach, a novel interpolation technique based on specialized spline functions for approximating the discrete electromagnetic field solution during mesh adaptation is introduced. The standard FIT on a fixed mesh and the new adaptive approach are applied to a simulation test case with a known analytical solution. The numerical accuracy of the two methods is shown to be comparable. The dynamic mesh approach is, however, much more efficient. This is demonstrated with the full scale modeling of the complete rf gun at the Photo Injector Test Facility DESY Zeuthen (PITZ on a single computer. Results of a detailed design study addressing the effects of individual components of the gun onto the beam emittance using a fully self-consistent approach are presented.

  8. Extension of the Finite Integration Technique including dynamic mesh refinement and its application to self-consistent beam dynamics simulations

    CERN Document Server

    Schnepp, Sascha M; Weiland, Thomas

    2011-01-01

    An extension of the framework of the Finite Integration Technique (FIT) including dynamic and adaptive mesh refinement is presented. After recalling the standard formulation of the FIT, the proposed mesh adaptation procedure is described. Besides the linear interpolation approach, a novel interpolation technique based on specialized spline functions for approximating the discrete electromagnetic field solution during mesh adaptation is introduced. The standard FIT on a fixed mesh and the new adaptive approach are applied to a simulation test case with known analytical solution. The numerical accuracy of the two methods are shown to be comparable. The dynamic mesh approach is, however, much more efficient. This is also demonstrated for the full scale modeling of the complete RF gun at the Photo Injector Test Facility DESY Zeuthen (PITZ) on a single computer. Results of a detailed design study addressing the effects of individual components of the gun onto the beam emittance using a fully self-consistent approa...

  9. Growth of CdTe on Si(100) surface by ionized cluster beam technique: Experimental and molecular dynamics simulation

    Science.gov (United States)

    Araghi, Houshang; Zabihi, Zabiholah; Nayebi, Payman; Ehsani, Mohammad Mahdi

    2016-10-01

    II-VI semiconductor CdTe was grown on the Si(100) substrate surface by the ionized cluster beam (ICB) technique. In the ICB method, when vapors of solid materials such as CdTe were ejected through a nozzle of a heated crucible into a vacuum region, nanoclusters were created by an adiabatic expansion phenomenon. The clusters thus obtained were partially ionized by electron bombardment and then accelerated onto the silicon substrate at 473 K by high potentials. The cluster size was determined using a retarding field energy analyzer. The results of X-ray diffraction measurements indicate the cubic zinc blende (ZB) crystalline structure of the CdTe thin film on the silicon substrate. The CdTe thin film prepared by the ICB method had high crystalline quality. The microscopic processes involved in the ICB deposition technique, such as impact and coalescence processes, have been studied in detail by molecular dynamics (MD) simulation.

  10. A Method to Improve Electron Density Measurement of Cone-Beam CT Using Dual Energy Technique

    Directory of Open Access Journals (Sweden)

    Kuo Men

    2015-01-01

    Full Text Available Purpose. To develop a dual energy imaging method to improve the accuracy of electron density measurement with a cone-beam CT (CBCT device. Materials and Methods. The imaging system is the XVI CBCT system on Elekta Synergy linac. Projection data were acquired with the high and low energy X-ray, respectively, to set up a basis material decomposition model. Virtual phantom simulation and phantoms experiments were carried out for quantitative evaluation of the method. Phantoms were also scanned twice with the high and low energy X-ray, respectively. The data were decomposed into projections of the two basis material coefficients according to the model set up earlier. The two sets of decomposed projections were used to reconstruct CBCT images of the basis material coefficients. Then, the images of electron densities were calculated with these CBCT images. Results. The difference between the calculated and theoretical values was within 2% and the correlation coefficient of them was about 1.0. The dual energy imaging method obtained more accurate electron density values and reduced the beam hardening artifacts obviously. Conclusion. A novel dual energy CBCT imaging method to calculate the electron densities was developed. It can acquire more accurate values and provide a platform potentially for dose calculation.

  11. Verification of passive cooling techniques in the Super-FRS beam collimators

    Science.gov (United States)

    Douma, C. A.; Gellanki, J.; Najafi, M. A.; Moeini, H.; Kalantar-Nayestanaki, N.; Rigollet, C.; Kuiken, O. J.; Lindemulder, M. F.; Smit, H. A. J.; Timersma, H. J.

    2016-08-01

    The Super FRagment Separator (Super-FRS) at the FAIR facility will be the largest in-flight separator of heavy ions in the world. One of the essential steps in the separation procedure is to stop the unwanted ions with beam collimators. In one of the most common situations, the heavy ions are produced by a fission reaction of a primary 238U-beam (1.5 GeV/u) hitting a 12C target (2.5 g/cm2). In this situation, some of the produced ions are highly charged states of 238U. These ions can reach the collimators with energies of up to 1.3 GeV/u and a power of up to 500 W. Under these conditions, a cooling system is required to prevent damage to the collimators and to the corresponding electronics. Due to the highly radioactive environment, both the collimators and the cooling system must be suitable for robot handling. Therefore, an active cooling system is undesirable because of the increased possibility of malfunctioning and other complications. By using thermal simulations (performed with NX9 of Siemens PLM), the possibility of passive cooling is explored. The validity of these simulations is tested by independent comparison with other simulation programs and by experimental verification. The experimental verification is still under analysis, but preliminary results indicate that the explored passive cooling option provides sufficient temperature reduction.

  12. Skin friction measurements by a new nonintrusive double-laser-beam oil viscosity balance technique

    Science.gov (United States)

    Monson, D. J.; Higuchi, H.

    1980-01-01

    A portable dual-laser-beam interferometer that nonintrusively measures skin friction by monitoring the thickness change of an oil film subject to shear stress is described. The method is an advance over past versions in that the troublesome and error-introducing need to measure the distance to the oil leading edge and the starting time for the oil flow has been eliminated. The validity of the method was verified by measuring oil viscosity in the laboratory, and then using those results to measure skin friction beneath the turbulent boundary layer in a low-speed wind tunnel. The dual-laser-beam skin friction measurements are compared with Preston tube measurements, with mean velocity profile data in a 'law-of-the-wall' coordinate system, and with computations based on turbulent boundary-layer theory. Excellent agreement is found in all cases. This validation and the aforementioned improvements appear to make the present form of the instrument usable to measure skin friction reliably and nonintrusively in a wide range of flow situations in which previous methods are not practical.

  13. Application of PIGE, BS and NRA techniques to oxygen profiling in steel joints using deuteron beam

    Science.gov (United States)

    Csedreki, L.; Huszank, R.

    2015-04-01

    In order to study the oxygen content and to characterize the oxygen depth profile on the surface of welded steel joints in the function of the applied shielding gases, particle induced gamma-ray emission (PIGE), backscattering spectrometry (BS) and nuclear reaction analysis (NRA) methods were used. The measurements were carried out at 1.0, 1.4 and 1.8 MeV deuteron energies. From the PIGE oxygen and carbon elemental maps (1000 × 1000 μm2) taken with a beam of 2 × 2 μm2 beam size, oxygen rich regions were chosen for the depth profile analysis. The investigated depth was ∼6 μm using particle detection (BS, NRA), which was extended to ∼11 μm with the application of the differential-PIGE method, using the numerical integration of experimental cross-section data. The oxygen depth profiles show systematic discrepancy in the oxide layer thickness and composition between the two different kind of shielding gases.

  14. Application of PIGE, BS and NRA techniques to oxygen profiling in steel joints using deuteron beam

    Energy Technology Data Exchange (ETDEWEB)

    Csedreki, L., E-mail: csedreki@atomki.mta.hu; Huszank, R.

    2015-04-01

    In order to study the oxygen content and to characterize the oxygen depth profile on the surface of welded steel joints in the function of the applied shielding gases, particle induced gamma-ray emission (PIGE), backscattering spectrometry (BS) and nuclear reaction analysis (NRA) methods were used. The measurements were carried out at 1.0, 1.4 and 1.8 MeV deuteron energies. From the PIGE oxygen and carbon elemental maps (1000 × 1000 μm{sup 2}) taken with a beam of 2 × 2 μm{sup 2} beam size, oxygen rich regions were chosen for the depth profile analysis. The investigated depth was ∼6 μm using particle detection (BS, NRA), which was extended to ∼11 μm with the application of the differential-PIGE method, using the numerical integration of experimental cross-section data. The oxygen depth profiles show systematic discrepancy in the oxide layer thickness and composition between the two different kind of shielding gases.

  15. 射频磁控溅射氧化钒薄膜的结构与性能研究%Structure and Property Study on Vanadium Oxide Thin Films Deposited by Radio Frequency Magnetron Sputtering Technique

    Institute of Scientific and Technical Information of China (English)

    刘黎明; 莫镜辉; 史衍丽; 曾华荣; 杨培志

    2012-01-01

    Aimed at uncooled microbolometer infrared detector applications,vanadium oxide thin films were fabricated successfully by the radio frequency magnetron sputtering technique at low temperature of 300℃.The crystalline,microstructure and composition of the films were characterized by X-ray diffraction (XRD),atomic force microscopy (AFM),energy-dispersive spectra (EDS) and X-ray photoelectron spectroscopy (XPS).The electric properties of the film were investigated using four-point probe technique.The results show that the film is VO2 phase and exhibits amorphous structure with smooth surface morphology.Semiconductor-to-metal phase transition was not observed for such an amorphous VO2 thin film in the temperature range of 22-100℃.Moreover,excellent performances such as temperature coefficient of resistance (TCR) of -2.1%/℃ at room temperature and sheet resistance of 600 kΩ/square was obtained in the VO2 thin film with suitable thickness (100 nm),suggesting a potential application in uncooled microbolometer infrared detectors.%以非制冷微测辐射热计型红外探测器应用为需求背景,采用射频磁控溅射技术在300℃低温条件下制备了氧化钒薄膜.采用X射线衍射(XRD)、原子力显微镜(AFM)、能量色散谱(EDS)及X射线光电子能谱(XPS)技术表征了薄膜的结晶状态、微观结构与化学组成.采用四探针技术研究了薄膜的电学性能.结果表明该薄膜主要为非晶态的二氧化钒( VO2),并具有光滑的表面形貌.这种非晶VO2薄膜在22~100℃温度范围内不存在半导体-金属相变.100 nm厚的非晶VO2薄膜室温下的面电阻为600 kΩ/,同时表现出-2.1%/℃的较高电阻温度系数(TCR),这表明该薄膜有希望用于非制冷微测辐射热计型红外探测器.

  16. Ion beam analysis techniques for the elemental fingerprinting of fine particle smoke from vegetation burning in NSW

    Energy Technology Data Exchange (ETDEWEB)

    Cohen, D. [Australian Nuclear Science and Technology Organisation, Lucas Heights, NSW (Australia)

    1996-12-31

    Accelerator based ion beam analysis (IBA) techniques, including PIXE, PIGME, RBS and PESA, have been used to analyse elemental compositions of airborne particles covering a 60,000 square kilometres area of Wollongong, Sydney and Newcastle. These IBA techniques provide elemental concentrations for over 20 different elements from hydrogen to lead, they include H, C, N, O, F, Na, Al, Si, P, S, Cl, K, Ca, Ti, V, Cr, Mn, Fe, Cu, Ni, Zn, Br and Pb. The four ion beam techniques are performed simultaneously on the 3MV Van de Graaff accelerator at ANSTO and have been described in detail elsewhere. They are sufficiently sensitive to analyse for many of these elements to levels around 10 ng/m{sup 3} or less in about five minutes of accelerator running time per filter. This is more than adequate for aerosol analyses as most filters contain around 150 {mu}g/cm{sup 2} of material which corresponds to about 10{mu}g/m{sup 3} of fine particles in the atmosphere. For this work fine particles are those with diameters less than 2.5{mu}m. Fine particle data has been collected twice a week and analysed for each of the above elements by ANSTO since 1991 at more than 25 different sites throughout NSW. This large dataset set allows us to not only determine the composition of fine particles and to look for signature elements for particular sources but also to use multivariate statistics to define elemental source fingerprints and then to determine the percentage contributions of these fingerprints to the total fine particle mass in the atmosphere. This paper describes the application of these techniques to the study of domestic wood fires and vegetation burning in NSW over a two year period from 1992-93. It also presents, for the first time, fine particle data related to the January 1994 bushfires in NSW. 6 refs., 1 tab., 5 figs.

  17. Development of magnetron sputtering simulator with GPU parallel computing

    Science.gov (United States)

    Sohn, Ilyoup; Kim, Jihun; Bae, Junkyeong; Lee, Jinpil

    2014-12-01

    Sputtering devices are widely used in the semiconductor and display panel manufacturing process. Currently, a number of surface treatment applications using magnetron sputtering techniques are being used to improve the efficiency of the sputtering process, through the installation of magnets outside the vacuum chamber. Within the internal space of the low pressure chamber, plasma generated from the combination of a rarefied gas and an electric field is influenced interactively. Since the quality of the sputtering and deposition rate on the substrate is strongly dependent on the multi-physical phenomena of the plasma regime, numerical simulations using PIC-MCC (Particle In Cell, Monte Carlo Collision) should be employed to develop an efficient sputtering device. In this paper, the development of a magnetron sputtering simulator based on the PIC-MCC method and the associated numerical techniques are discussed. To solve the electric field equations in the 2-D Cartesian domain, a Poisson equation solver based on the FDM (Finite Differencing Method) is developed and coupled with the Monte Carlo Collision method to simulate the motion of gas particles influenced by an electric field. The magnetic field created from the permanent magnet installed outside the vacuum chamber is also numerically calculated using Biot-Savart's Law. All numerical methods employed in the present PIC code are validated by comparison with analytical and well-known commercial engineering software results, with all of the results showing good agreement. Finally, the developed PIC-MCC code is parallelized to be suitable for general purpose computing on graphics processing unit (GPGPU) acceleration, so as to reduce the large computation time which is generally required for particle simulations. The efficiency and accuracy of the GPGPU parallelized magnetron sputtering simulator are examined by comparison with the calculated results and computation times from the original serial code. It is found that

  18. A COMPLEX—TYPE FOCUSSED MAGNTRON FOR SPUTTERING

    Institute of Scientific and Technical Information of China (English)

    郑思孝

    1994-01-01

    The design of a small complex-type focussed magnetron with a long target-life used for excited multi-atoms beam film deposition in hard coatings is described.The magnetron tunnel of the magentron source was constructed by a planar unbalanced magnetic annulus,which comes from the extended co-axial magnetron principle and inside cylindrical magnet tunnel.The use efficinecy of inside circular cone sputtering target area is high up to 62%.The inside-inversion cone sputtering target has a long life and results in a higher deposition rate 35nm/min for Ti at a 2.5Pa Ar pressure.A better focussing direction of ejecting atom beam has been achieved,and the are power input is 300W for Ti target.

  19. Sputtered film thermistor IR detectors

    Science.gov (United States)

    Baliga, Shankar B.; Rost, Martin R.; Doctor, Alan P.

    1994-07-01

    The thermistor infrared detector or bolometer is the detector of choice in many classical remote sensing applications such as horizon sensing, noncontact thermometry, and industrial applications. In recent years, the authors have developed a thin film process where the thermistor material is deposited from a target directly onto the substrate. This is an advance over the labor intensive ceramic technology, where sintered flakes of the thermistor are bonded to the substrate. The thin film technique permits a variety of device constructions and configurations. Detectors fabricated on heat-sunk ceramic substrates can withstand high operating temperatures and large incident optical power, in both pulsed and CW laser measurements. For dc or low frequency measurements, the films can be deposited onto a thermally isolated membrane with applications in motion sensing, gas detection, and temperature measurement. Utilizing advances in micromachining a 2D array of thermally isolated microbolometer sensors, integrated onto a silicon wafer containing readout circuitry may be achieved. This paper describes the construction of the sputtered film thermistor detectors, their operation, and applications.

  20. PGE Anion Production from the Sputtering of Natural Insulating Samples: "Lessons in Ion Sourcery"

    Science.gov (United States)

    Krestow, Jennifer Sarah Anne

    The goal of this research was to devise a new analytical technique, using Accelerator Mass Spectrometry (AMS), to measure Platinum Group Element (PGE) concentrations to the sup-ppb levels in natural, insulating, samples. The challenges were threefold. First, a method of sputtering an insulating sample to successfully produce a stable beam of anions needed to be devised. Second, a suitable standard of known PGE concentrations had to be found and third, spectral analysis of the beam had to verify any claims of PGE abundance. The first challenge was met by employing a modified high intensity negative ion source flooded with neutral caesium that successfully sputtered insulators to produce a beam of negative ions. The second challenge, that of finding a suitable standard, was fraught with difficulties, as no synthesized standards available were found to be appropriate for this work. As a result, direction is provided for future production of standards by ion implantation. The third challenge, successful spectral analysis, was accomplished using a newly designed gas ionization detector which allowed for resolution of the interfering molecular fragment from the PGE ions. Coupled with the use of the SRIM computer programme, positive identification of all peaks in the spectra of the analyzed samples was accomplished. The success of the first and third challenges lead to the qualitative analyses of geological samples for sub-ppb levels of PGE by AMS. Quantitative analyses await only for the appropriate standards and with those will come a whole new range of research possibilities for measuring sub-ppb levels of PGE in insulating samples by AMS.

  1. Ion beams in materials processing and analysis

    CERN Document Server

    Schmidt, Bernd

    2012-01-01

    This book covers ion beam application in modern materials research, offering the basics of ion beam physics and technology and a detailed account of the physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning.

  2. A Monte Carlo code to optimize the production of Radioactive Ion Beams by the ISOL technique

    CERN Document Server

    Santana-Leitner, M

    2005-01-01

    Currently the nuclear chart includes around 3000 nuclides, distributed as ${\\beta}^+$, ${\\beta}^-$ and $\\alpha$-emitters, stable and spontaneously fissioning isotopes. A similar amount of unknown nuclei belongs to the so-called \\textit{terra incognita}, the uncertain region contained also within the proton, neutron and (fast) fission driplines and thereby stable against nucleon emission. The exploration of this zone is to be assisted by the use of radioactive ion beams (RIB) and could provide a new understanding of several nuclear properties. Moreover, besides pointing at crucial questions such as the validity of the shell model, the dilute matter and the halo structure, challenging experiments outside nuclear physics are also attended, e.g., explanations of the nucleosythesis processes that may justify why the matter in the universe has evolved to present proportions of elements, and which represents a major challenge to nuclear physics. These, together with other fascinating research lines in particle physi...

  3. Lithium diffusion in sputter-deposited Li4Ti5O12 thin films

    Science.gov (United States)

    Wunde, F.; Berkemeier, F.; Schmitz, G.

    2012-10-01

    Li4Ti5O12 (LTO) thin films are deposited by dc-ion beam sputtering at different oxygen partial pressures and different substrate temperatures. In order to investigate, how these two parameters influence the atomic structure, the specimens are characterized by X-ray diffraction and transmission electron microscopy. Electrochemical characterization of the films is done by cyclic voltammetry and chrono-potentiometry. To determine an averaged chemical diffusion coefficient of lithium, a method is developed, evaluating c-rate tests. The results obtained by this method are compared to results obtained by the well established galvanostatic intermittent titration technique (GITT), which is used to determine a concentration dependent diffusion coefficient of lithium in LTO.

  4. Combined elemental analysis of ancient glass beads by means of ion beam, portable XRF, and EPMA techniques.

    Science.gov (United States)

    Sokaras, D; Karydas, A G; Oikonomou, A; Zacharias, N; Beltsios, K; Kantarelou, V

    2009-12-01

    Ion beam analysis (IBA)- and X-ray fluorescence (XRF)-based techniques have been well adopted in cultural-heritage-related analytical studies covering a wide range of diagnostic role, i.e., from screening purposes up to full quantitative characterization. In this work, a systematic research was carried out towards the identification and evaluation of the advantages and the limitations of laboratory-based (IBA, electron probe microanalyzer) and portable (milli-XRF and micro-XRF) techniques. The study focused on the analysis of an Archaic glass bead collection recently excavated from the city of Thebes (mainland, Greece), in order to suggest an optimized and synergistic analytical methodology for similar studies and to assess the reliability of the quantification procedure of analyses conducted in particular by portable XRF spectrometers. All the employed analytical techniques and methodologies proved efficient to provide in a consistent way characterization of the glass bead composition, with analytical range and sensitivity depending on the particular technique. The obtained compositional data suggest a solid basis for the understanding of the main technological features related to the raw major and minor materials utilized for the manufacture of the Thebian ancient glass bead collection.

  5. Two-beam laser fabrication technique and the application for fabricating conductive silver nanowire on flexible substrate

    Science.gov (United States)

    He, Gui-Cang; Zheng, Mei-Ling; Dong, Xian-Zi; Liu, Jie; Duan, Xuan-Ming; Zhao, Zhen-Sheng

    2017-03-01

    In this study, a two-beam laser fabrication technique is proposed to fabricate silver nanowire (AgNW) on the polyethylene terephthalate (PET) substrate. The femtosecond pulse laser in the technique plays a role in generating Ag nanoparticles from the silver aqueous solution by multiphoton photoreduction. The continuous wave (CW) laser of the technique works as optical tweezers, and make the Ag nanoparticles gather to a continuous AgNW by the optical trapping force. The optical trapping force of the CW laser was calculated under our experimental condition. The flexibility and the resistance stability of the AgNW that fabricated by this technique are very excellent. Compared to the resistance of the AgNW without bending, the decreasing rate of the AgNW resistance is about 16% under compressed bending condition at the radius of 1 mm, and the increasing rate of the AgNW resistance is only 1.3% after the AgNW bended about 3500 times at the bending radius of 1 mm. The study indicates that the AgNW is promising for achieving flexible device and would promote the development of the flexible electronics.

  6. Two-beam laser fabrication technique and the application for fabricating conductive silver nanowire on flexible substrate

    Directory of Open Access Journals (Sweden)

    Gui-Cang He

    2017-03-01

    Full Text Available In this study, a two-beam laser fabrication technique is proposed to fabricate silver nanowire (AgNW on the polyethylene terephthalate (PET substrate. The femtosecond pulse laser in the technique plays a role in generating Ag nanoparticles from the silver aqueous solution by multiphoton photoreduction. The continuous wave (CW laser of the technique works as optical tweezers, and make the Ag nanoparticles gather to a continuous AgNW by the optical trapping force. The optical trapping force of the CW laser was calculated under our experimental condition. The flexibility and the resistance stability of the AgNW that fabricated by this technique are very excellent. Compared to the resistance of the AgNW without bending, the decreasing rate of the AgNW resistance is about 16% under compressed bending condition at the radius of 1 mm, and the increasing rate of the AgNW resistance is only 1.3% after the AgNW bended about 3500 times at the bending radius of 1 mm. The study indicates that the AgNW is promising for achieving flexible device and would promote the development of the flexible electronics.

  7. Surface processing using water cluster ion beams

    Science.gov (United States)

    Takaoka, Gikan H.; Ryuto, Hiromichi; Takeuchi, Mitsuaki; Ichihashi, Gaku

    2013-07-01

    Vaporized water clusters were produced by an adiabatic expansion phenomenon, and various substrates such as Si(1 0 0), SiO2, polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), and polycarbonate (PC) were irradiated by water cluster ion beams. The sputtered depth increased with increasing acceleration voltage, and the sputtering rate was much larger than that obtained using Ar monomer ion irradiation. The sputtering yield for PMMA was approximately 200 molecules per ion, at an acceleration voltage of 9 kV. X-ray photoelectron spectroscopy (XPS) measurements showed that high-rate sputtering for the PMMA surface can be ascribed to the surface erosion by the water cluster ion irradiation. Furthermore, the micropatterning was demonstrated on the PMMA substrate. Thus, the surface irradiation by water cluster ion beams exhibited a chemical reaction based on OH radicals, as well as excited hydrogen atoms, which resulted in a high sputtering rate and low irradiation damage of the substrate surfaces.

  8. Surface processing using water cluster ion beams

    Energy Technology Data Exchange (ETDEWEB)

    Takaoka, Gikan H., E-mail: gtakaoka@kuee.kyoto-u.ac.jp [Photonics and Electronics Science and Engineering Center, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510 (Japan); Ryuto, Hiromichi; Takeuchi, Mitsuaki; Ichihashi, Gaku [Photonics and Electronics Science and Engineering Center, Kyoto University, Katsura, Nishikyo-ku, Kyoto 615-8510 (Japan)

    2013-07-15

    Vaporized water clusters were produced by an adiabatic expansion phenomenon, and various substrates such as Si(1 0 0), SiO{sub 2}, polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), and polycarbonate (PC) were irradiated by water cluster ion beams. The sputtered depth increased with increasing acceleration voltage, and the sputtering rate was much larger than that obtained using Ar monomer ion irradiation. The sputtering yield for PMMA was approximately 200 molecules per ion, at an acceleration voltage of 9 kV. X-ray photoelectron spectroscopy (XPS) measurements showed that high-rate sputtering for the PMMA surface can be ascribed to the surface erosion by the water cluster ion irradiation. Furthermore, the micropatterning was demonstrated on the PMMA substrate. Thus, the surface irradiation by water cluster ion beams exhibited a chemical reaction based on OH radicals, as well as excited hydrogen atoms, which resulted in a high sputtering rate and low irradiation damage of the substrate surfaces.

  9. IBA analysis and corrosion resistance of TiAlPtN/TiAlN/TiAl multilayer films deposited over a CoCrMo using magnetron sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Canto, C.E., E-mail: carloscanto2012@yahoo.com.mx [Instituto de Física, Universidad Nacional Autónoma de México, Apartado Postal 20-364, 01000 México D.F. (Mexico); Andrade, E.; Lucio, O. de; Cruz, J.; Solís, C. [Instituto de Física, Universidad Nacional Autónoma de México, Apartado Postal 20-364, 01000 México D.F. (Mexico); Rocha, M.F. [ESIME-Z, IPN, U.P. ALM, Gustavo A. Madero, C.P. 07738 México D.F. (Mexico); Alemón, B. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jalisco 45101 (Mexico); Tecnológico de Monterrey, Av. General Ramón Corona 2514, Col. Nuevo México, Zapopan, Jalisco 45201 (Mexico); Flores, M. [Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, J. Guadalupe Zuno 48, Los Belenes, Zapopan, Jalisco 45101 (Mexico); Huegel, J.C. [Tecnológico de Monterrey, Av. General Ramón Corona 2514, Col. Nuevo México, Zapopan, Jalisco 45201 (Mexico)

    2016-03-15

    The corrosion resistance and the elemental profile of multilayer coatings of TiAlPtN/TiAlN/TiAl synthesized by Physical Vapor Deposition (PVD) reactive magnetron sputtering over a CoCrMo alloy substrate in 10 periods of 30 min each were analyzed and compared to those of the substrate alone and to that of a TiAlPtN single layer coating of the same thickness. The objective of the present work was to create multilayers with different amounts of Pt to enhance the corrosion resistance of a biomedical alloy of CoCrMo. Corrosion tests were performed using Simulated Body Fluid (SBF) using potentiodynamic polarization tests at typical body temperature. The elemental composition and thickness of the coatings were evaluated with the combination of two ion beam analysis (IBA) techniques: a Rutherford Backscattering Spectroscopy (RBS) with alpha beam and a Nuclear Reaction Analysis with a deuteron beam.

  10. Variance reduction technique in a beta radiation beam using an extrapolation chamber.

    Science.gov (United States)

    Polo, Ivón Oramas; Souza Santos, William; de Lara Antonio, Patrícia; Caldas, Linda V E

    2017-10-01

    This paper aims to show how the variance reduction technique "Geometry splitting/Russian roulette" improves the statistical error and reduces uncertainties in the determination of the absorbed dose rate in tissue using an extrapolation chamber for beta radiation. The results show that the use of this technique can increase the number of events in the chamber cavity leading to a closer approximation of simulation result with the physical problem. There was a good agreement among the experimental measurements, the certificate of manufacture and the simulation results of the absorbed dose rate values and uncertainties. The absorbed dose rate variation coefficient using the variance reduction technique "Geometry splitting/Russian roulette" was 2.85%. Copyright © 2017 Elsevier Ltd. All rights reserved.

  11. Structural properties and surface wettability of Cu-containing diamond-like carbon films prepared by a hybrid linear ion beam deposition technique

    Energy Technology Data Exchange (ETDEWEB)

    Guo, Peng; Sun, Lili; Li, Xiaowei [Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China); Xu, Sheng [Gao Hong Coating Technology Co., Ltd, Huzhou 313000 (China); Ke, Peiling [Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China); Wang, Aiying, E-mail: aywang@nimte.ac.cn [Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China)

    2015-06-01

    Cu-containing diamond-like carbon (Cu-DLC) films were deposited on Si/glass substrate by a hybrid ion beam deposition system. The Cu concentration (0.1–39.7 at.%) in the film was controlled by varying the sputtering current. The microstructure and composition of Cu-DLC films were investigated systematically. The surface topography, roughness and surface wettability of the films were also studied. Results indicated that with increasing the Cu concentration, the water contact angle of the films changed from 66.8° for pure carbon film to more than 104.4° for Cu-DLC films with Cu concentration larger than 24.4 at.%. In the hydrophilic region, the polar surface energy decreased from 30.54 mJ/m{sup 2} for pure carbon film to 2.48 mJ/m{sup 2} for the film with Cu 7.0 at.%. - Highlights: • Cu-containing diamond-like carbon (DLC) films were deposited by a hybrid ion beam system. • Cu-containing DLC films exhibited a wide range of water contact angle. • The water contact angles vary with the surface energies and surface roughness.

  12. Sputtered Al-doped ZnO transparent conducting thin films suitable for silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Ben Ayadi, Z., E-mail: Zouhaier.BenAyadi@fsg.rnu.tn [Laboratoire de Physique des Matériaux et des Nanomatériaux appliquée à l' Environnement, Université de Gabès, Faculté des Sciences de Gabès, Cité Erriadh Manara Zrig, 6072 Gabès (Tunisia); Mahdhi, H. [Laboratoire de Physique des Matériaux et des Nanomatériaux appliquée à l' Environnement, Université de Gabès, Faculté des Sciences de Gabès, Cité Erriadh Manara Zrig, 6072 Gabès (Tunisia); Djessas, K. [Laboratoire Procédés, Matériaux et Energie Solaire (PROMES-CNRS), TECNOSUD, Rambla de la Thermodynamique, 66100 Perpignan (France); Université de Perpignan Via Domitia, 52 Avenue Paul Alduy, 68860, Perpignan Cedex9 (France); Gauffier, J.L. [Département de Génie Physique, INSA de Toulouse, 135 Avenue de Rangueil, 31077 Toulouse cedex 4 (France); and others

    2014-02-28

    Highly transparent conducting Al-doped zinc oxide (AZO) thin films have been grown onto p-type porous silicon substrates by RF-magnetron sputtering at room temperature using aluminum doped nanocrystalline powder. The obtained AZO films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. The films are highly transparent in the visible wavelength region with a transmittance higher than 85% and an electrical resistivity of 1.56 × 10{sup −4} Ω·cm was obtained at room temperature. On the other hand, we have studied the position of the p–n junction involved in the In{sub 2}O{sub 3}:SnO{sub 2}/(n)AZO/Si(p) structure, by electron-beam induced current technique. Current density–voltage characterizations in dark and under illumination were also investigated. The cell exhibits an efficiency of 5%. - Highlights: • Al-doped zinc oxide (AZO) thin films were grown by RF-magnetron sputtering. • AZO nanopowder compacted target was prepared by a sol–gel method. • AZO thin films are polycrystalline and have preferred orientation along c-axis. • We report a photovoltaic effect in Si(p)/porous silicon/AZO heterostructure. • The cell exhibits an efficiency of 5%.

  13. Simple technique to achieve a natural position of the head for cone beam computed tomography

    NARCIS (Netherlands)

    Damstra, Janalt; Fourie, Zacharias; Ren, Yijin

    2010-01-01

    We developed a modified laser level technique to record the natural position of the head in all three planes of space. This is a simple method for use with three-dimensional images and may be valuable in routine craniofacial assessment.

  14. X-ray micro-beam techniques and phase contrast tomography applied to biomaterials

    Science.gov (United States)

    Fratini, Michela; Campi, Gaetano; Bukreeva, Inna; Pelliccia, Daniele; Burghammer, Manfred; Tromba, Giuliana; Cancedda, Ranieri; Mastrogiacomo, Maddalena; Cedola, Alessia

    2015-12-01

    A deeper comprehension of the biomineralization (BM) process is at the basis of tissue engineering and regenerative medicine developments. Several in-vivo and in-vitro studies were dedicated to this purpose via the application of 2D and 3D diagnostic techniques. Here, we develop a new methodology, based on different complementary experimental techniques (X-ray phase contrast tomography, micro-X-ray diffraction and micro-X-ray fluorescence scanning technique) coupled to new analytical tools. A qualitative and quantitative structural investigation, from the atomic to the micrometric length scale, is obtained for engineered bone tissues. The high spatial resolution achieved by X-ray scanning techniques allows us to monitor the bone formation at the first-formed mineral deposit at the organic-mineral interface within a porous scaffold. This work aims at providing a full comprehension of the morphology and functionality of the biomineralization process, which is of key importance for developing new drugs for preventing and healing bone diseases and for the development of bio-inspired materials.

  15. X-ray micro-beam techniques and phase contrast tomography applied to biomaterials

    Energy Technology Data Exchange (ETDEWEB)

    Fratini, Michela, E-mail: michela.fratini@gmail.com [Museo Storico della Fisica e Centro Studi e Ricerche Enrico Fermi, 00184 Roma (Italy); Dipartimento di Scienze, Università di Roma Tre, 00144 Roma (Italy); Campi, Gaetano [Institute of Crystallography, CNR, 00015 Monterotondo, Roma (Italy); Bukreeva, Inna [CNR NANOTEC-Institute of Nanotechnology, 00195 Roma (Italy); P.N. Lebedev Physical Institute RAS, 119991 Moscow (Russian Federation); Pelliccia, Daniele [School of Physics, Monash University, Victoria 3800 (Australia); Burghammer, Manfred [ESRF-The European Synchrotron, 3800 Grenoble (France); Tromba, Giuliana [Sincrotrone Trieste SCpA, 34149 Basovizza, Trieste (Italy); Cancedda, Ranieri; Mastrogiacomo, Maddalena [Dipartimento di Medicina Sperimentale dell’Università di Genova & AUO San Martino-IST Istituto Nazionale per la Ricerca sul Cancro, 16132 Genova (Italy); Cedola, Alessia [CNR NANOTEC-Institute of Nanotechnology, 00195 Roma (Italy)

    2015-12-01

    A deeper comprehension of the biomineralization (BM) process is at the basis of tissue engineering and regenerative medicine developments. Several in-vivo and in-vitro studies were dedicated to this purpose via the application of 2D and 3D diagnostic techniques. Here, we develop a new methodology, based on different complementary experimental techniques (X-ray phase contrast tomography, micro-X-ray diffraction and micro-X-ray fluorescence scanning technique) coupled to new analytical tools. A qualitative and quantitative structural investigation, from the atomic to the micrometric length scale, is obtained for engineered bone tissues. The high spatial resolution achieved by X-ray scanning techniques allows us to monitor the bone formation at the first-formed mineral deposit at the organic–mineral interface within a porous scaffold. This work aims at providing a full comprehension of the morphology and functionality of the biomineralization process, which is of key importance for developing new drugs for preventing and healing bone diseases and for the development of bio-inspired materials.

  16. Fabrication of PEFC membrane based on perfluorinated polymer using quantum beam induced grafting technique

    Science.gov (United States)

    Oshima, Akihiro; Sato, Yukiko; Shiraki, Fumiya; Mitani, Naohiro; Fujii, Kazuki; Oshima, Yuji; Fujita, Hajime; Washio, Masakazu

    2011-02-01

    The performance of a polymer electrolyte fuel cell (PEFC) is affected by the interfacial property between the proton exchange membrane (PEM) and the electrodes. Thus, development of well-laminated membrane electrode assemblies (MEAs) has been carried out. The hybrid PEM, consisting of perfluoro-sulfonic acid (PFSA) ionomer and sulfonated polystyrene grafted tetrafluoroethylene-co-hexafluoropropylene (sulfonated PS-g-FEP) synthesized by the soft electron beam (soft-EB) induced grafting method, was fabricated by mixing sulfonated PS-g-FEP with PFSA ionomer, which is coated on the interface of the PEM and the electrodes. The obtained hybrid PEM was characterized in terms of water uptake, ion exchange capacity, polarization performance and electrochemical impedance. The ion exchange capacity (IEC) of the hybrid PEM was 1.0-1.2 meq/g. The polarization curve and electrochemical impedance of the hybrid PEM was analyzed. As a result, the ionic conductivity was 0.16 S/cm and is the highest in the tested PEMs. The maximum power density is about 1.0 W/cm 2 with low humidity (relative humidity RH: 16%), which is 1.5 times higher than that of commercially available Nafion ® 112.

  17. Fabrication of PEFC membrane based on perfluorinated polymer using quantum beam induced grafting technique

    Energy Technology Data Exchange (ETDEWEB)

    Oshima, Akihiro, E-mail: akoshima@sanken.osaka-u.ac.j [Institute of Scientific and Industrial Research (ISIR), Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047 (Japan); Sato, Yukiko; Shiraki, Fumiya; Mitani, Naohiro; Fujii, Kazuki; Oshima, Yuji; Fujita, Hajime; Washio, Masakazu [Research Institute for Science and Engineering (RISE), Waseda University, 3-4-1 Okubo, Shinjuku 169-8555 (Japan)

    2011-02-15

    The performance of a polymer electrolyte fuel cell (PEFC) is affected by the interfacial property between the proton exchange membrane (PEM) and the electrodes. Thus, development of well-laminated membrane electrode assemblies (MEAs) has been carried out. The hybrid PEM, consisting of perfluoro-sulfonic acid (PFSA) ionomer and sulfonated polystyrene grafted tetrafluoroethylene-co-hexafluoropropylene (sulfonated PS-g-FEP) synthesized by the soft electron beam (soft-EB) induced grafting method, was fabricated by mixing sulfonated PS-g-FEP with PFSA ionomer, which is coated on the interface of the PEM and the electrodes. The obtained hybrid PEM was characterized in terms of water uptake, ion exchange capacity, polarization performance and electrochemical impedance. The ion exchange capacity (IEC) of the hybrid PEM was 1.0-1.2 meq/g. The polarization curve and electrochemical impedance of the hybrid PEM was analyzed. As a result, the ionic conductivity was 0.16 S/cm and is the highest in the tested PEMs. The maximum power density is about 1.0 W/cm{sup 2} with low humidity (relative humidity RH: 16%), which is 1.5 times higher than that of commercially available Nafion 112.

  18. Electron-beam lithography with character projection technique for high-throughput exposure with line-edge quality control

    Science.gov (United States)

    Ikeno, Rimon; Maruyama, Satoshi; Mita, Yoshio; Ikeda, Makoto; Asada, Kunihiro

    2016-07-01

    The high throughput of character projection (CP) electron-beam (EB) lithography makes it a promising technique for low-to-medium volume device fabrication with regularly arranged layouts, such as for standard-cell logics and memory arrays. However, non-VLSI applications such as MEMS and MOEMS may not be able to fully utilize the benefits of the CP method due to the wide variety of layout figures including curved and oblique edges. In addition, the stepwise shapes that appear because of the EB exposure process often result in intolerable edge roughness, which degrades device performances. In this study, we propose a general EB lithography methodology for such applications utilizing a combination of the CP and variable-shaped beam methods. In the process of layout data conversion with CP character instantiation, several control parameters were optimized to minimize the shot count, improve the edge quality, and enhance the overall device performance. We have demonstrated EB shot reduction and edge-quality improvement with our methodology by using a leading-edge EB exposure tool, ADVANTEST F7000S-VD02, and a high-resolution hydrogen silsesquioxane resist. Atomic force microscope observations were used to analyze the resist edge profiles' quality to determine the influence of the control parameters used in the data conversion process.

  19. Enthalpy changes during photosynthetic water oxidation tracked by time-resolved calorimetry using a photothermal beam deflection technique.

    Science.gov (United States)

    Krivanek, Roland; Dau, Holger; Haumann, Michael

    2008-03-01

    The energetics of the individual reaction steps in the catalytic cycle of photosynthetic water oxidation at the Mn(4)Ca complex of photosystem II (PSII) are of prime interest. We studied the electron transfer reactions in oxygen-evolving PSII membrane particles from spinach by a photothermal beam deflection technique, allowing for time-resolved calorimetry in the micro- to millisecond domain. For an ideal quantum yield of 100%, the enthalpy change, DeltaH, coupled to the formation of the radical pair Y(Z)(.+)Q(A)(-) (where Y(Z) is Tyr-161 of the D1 subunit of PSII) is estimated as -820 +/- 250 meV. For a lower quantum yield of 70%, the enthalpy change is estimated to be -400 +/- 250 meV. The observed nonthermal signal possibly is due to a contraction of the PSII protein volume (apparent DeltaV of about -13 A(3)). For the first time, the enthalpy change of the O(2)-evolving transition of the S-state cycle was monitored directly. Surprisingly, the reaction is only slightly exergonic. A value of DeltaH(S(3)-->S(0)) of -210 meV is estimated, but also an enthalpy change of zero is within the error range. A prominent nonthermal photothermal beam deflection signal (apparent DeltaV of about +42 A(3)) may reflect O(2) and proton release from the manganese complex, but also reorganization of the protein matrix.

  20. High temperature oxidation resistance of fluorine-treated TiAl alloys: Chemical vs. ion beam fluorination techniques

    Science.gov (United States)

    Neve, Sven; Masset, Patrick J.; Yankov, Rossen A.; Kolitsch, Andreas; Zschau, Hans-Eberhard; Schütze, Michael

    2010-11-01

    The modification of the alloy surface by halogens significantly improves their oxidation behaviour at high temperature. It corresponds to the preferential reaction of the aluminium with the applied fluorine at the oxide/alloy interface and it promotes the growth of an adherent and stable alumina layer. Well-defined fluorine profiles beneath the surface of the material can be achieved by either fluorine beam line ion implantation (BLI 2) or plasma immersion ion implantation (PI 3). As an alternative to the implantation-based approach, chemical fluorination techniques such as gas-phase treatment and dipping in F-based solutions were also investigated. The fluorine depth-profiles were measured before and after oxidation at 900 °C using non destructive ion beam analyses: Proton Induced Gamma-ray Emission (PIGE), Rutherford Backscattering Spectroscopy (RBS) as well as Elastic Recoil Detection Analysis (ERDA). It enables to control and to optimise the fluorination conditions of technical TiAl alloys for an industrial application.

  1. Direct Trace Element Analysis of Liquid Blood Samples by In-Air Ion Beam Analytical Techniques (PIXE-PIGE).

    Science.gov (United States)

    Huszank, Robert; Csedreki, László; Török, Zsófia

    2017-02-07

    There are various liquid materials whose elemental composition is of interest in various fields of science and technology. In many cases, sample preparation or the extraction can be complicated, or it would destroy the original environment before the analysis (for example, in the case of biological samples). However, multielement direct analysis of liquid samples can be realized by an external PIXE-PIGE measurement system. Particle-induced X-ray and gamma-ray emission spectroscopy (PIXE, PIGE) techniques were applied in external (in-air) microbeam configuration for the trace and main element determination of liquid samples. The direct analysis of standard solutions of several metal salts and human blood samples (whole blood, blood serum, blood plasma, and formed elements) was realized. From the blood samples, Na, P, S, Cl, K, Ca, Fe, Cu, Zn, and Br elemental concentrations were determined. The focused and scanned ion beam creates an opportunity to analyze very small volume samples (∼10 μL). As the sample matrix consists of light elements, the analysis is possible at ppm level. Using this external beam setup, it was found that it is possible to determine elemental composition of small-volume liquid samples routinely, while the liquid samples do not require any preparation processes, and thus, they can be analyzed directly. In the case of lower concentrations, the method is also suitable for the analysis (down to even ∼1 ppm level) but with less accuracy and longer measurement times.

  2. Application of Monte Carlo techniques to optimization of high-energy beam transport in a stochastic environment

    Science.gov (United States)

    Parrish, R. V.; Dieudonne, J. E.; Filippas, T. A.

    1971-01-01

    An algorithm employing a modified sequential random perturbation, or creeping random search, was applied to the problem of optimizing the parameters of a high-energy beam transport system. The stochastic solution of the mathematical model for first-order magnetic-field expansion allows the inclusion of state-variable constraints, and the inclusion of parameter constraints allowed by the method of algorithm application eliminates the possibility of infeasible solutions. The mathematical model and the algorithm were programmed for a real-time simulation facility; thus, two important features are provided to the beam designer: (1) a strong degree of man-machine communication (even to the extent of bypassing the algorithm and applying analog-matching techniques), and (2) extensive graphics for displaying information concerning both algorithm operation and transport-system behavior. Chromatic aberration was also included in the mathematical model and in the optimization process. Results presented show this method as yielding better solutions (in terms of resolutions) to the particular problem than those of a standard analog program as well as demonstrating flexibility, in terms of elements, constraints, and chromatic aberration, allowed by user interaction with both the algorithm and the stochastic model. Example of slit usage and a limited comparison of predicted results and actual results obtained with a 600 MeV cyclotron are given.

  3. A Single Shot, Sub-picosecond Beam Bunch Characterization with Electro-optic Techniques

    CERN Document Server

    Semertzidis, Y K; Castillo, V; Larsen, R; Lazarus, D M; Nikas, D; Ozben, C; Srinivasan-Rao, T; Stillman, A; Tsang, Thomas; Kowalski, L A

    2001-01-01

    In the past decade, the bunch lengths of electrons in accelerators have decreased dramatically to the range of a few picoseconds \\cite{Uesaka94,Trotz97}. Measurement of the length as well as the longitudinal profile of these short bunches have been a topic of research in a number of institutions \\cite{Uesaka97,Liu97,Hutchins00}. One of the techniques uses the electric field induced by the passage of electrons in the vicinity of a birefringent crystal to change its optical characteristics. Well-established electro-optic techniques can then be used to measure the temporal characteristics of the electron bunch. In this paper we present a novel, non-invasive, single-shot approach to improve the resolution to tens of femtoseconds so that sub-millimeter bunch length can be measured.

  4. A Method for Eliminating Beam Steering Error for the Modulated Absorption-Emission Thermometry Technique

    Science.gov (United States)

    2015-01-01

    currently valid OMB control number. PLEASE DO NOT RETURN YOUR FORM TO THE ABOVE ADDRESS. 1. REPORT DATE (DD-MM-YYYY) December 2014 2. REPORT TYPE...Briefing Charts 3. DATES COVERED (From - To) December 2014- January 2015 4. TITLE AND SUBTITLE 5a. CONTRACT NUMBER N/A A Method for Eliminating...Jan 2015. PA#14562. 14. ABSTRACT Modulated absorption-emission thermometry (MAET) is a non-intrusive, radiometric technique for measuring line-of

  5. Fabrication of high sensitivity 3D nanoSQUIDs based on a focused ion beam sculpting technique

    Science.gov (United States)

    De Leo, Natascia; Fretto, Matteo; Lacquaniti, Vincenzo; Granata, Carmine; Vettoliere, Antonio

    2016-09-01

    In this paper a nanofabrication process, based on a focused ion beam (FIB) nanosculpting technique, for high sensitivity three-dimensional nanoscale superconducting quantum interference devices (nanoSQUIDs) is reported. The crucial steps of the fabrication process are described, as are some peculiar features of the superconductor-normal metal-insulator-superconductor (SNIS) Josephson junctions, which may useful for applications in cryocooler systems. This fabrication procedure is employed to fabricate sandwich nanojunctions and high sensitivity nanoSQUIDs. Specifically, the superconductive nanosensors have a rectangular loop of 1 × 0.2-0.4 μm2 interrupted by two square Nb/Al-AlO x /Nb SNIS Josephson junctions with side lengths of 0.3 μm. The characterization of a typical nanoSQUID has been carried out and a spectral density of magnetic flux noise as low as 0.8 μΦ0 Hz-1/2 has been measured.

  6. Sputtering of solid neon by keV hydrogen ions

    DEFF Research Database (Denmark)

    Ellegaard, Ole; Schou, Jørgen; Sørensen, H.

    1986-01-01

    Sputtering of solid Ne with the hydrogen ions H+1, H+2 and H+3 in the energy range 1–10 keV/atom has been studied by means of a quartz microbalance technique. No enhancement in the yield per atom for molecular ions was found. The results for hydrogen ions are compared with data for keV electrons....

  7. The evaluation of properties for radiation therapy techniques with flattening filter-free beam and usefulness of time and economy to a patient with the radiation therapy

    Energy Technology Data Exchange (ETDEWEB)

    Goo, Jang Hyeon; Won, Hui Su; Hong, Joo Wan; Chang, Nam Jun; Park, Jin Hong [Dept. of Radiation Oncology, Seoul national university Bundang hospital, Sungnam (Korea, Republic of)

    2014-12-15

    The aim of this study was to appraise properties for radiation therapy techniques and effectiveness of time and economy to a patient in the case of applying flattening filter-free (3F) and flattening filter (2F) beam to the radiation therapy. Alderson rando phantom was scanned for computed tomography image. Treatment plans for intensity modulated radiation therapy (IMRT), volumetric modulated arc therapy (VMAT) and stereotactic body radiation therapy (SBRT) with 3F and 2F beam were designed for prostate cancer. To evaluate the differences between the 3F and 2F beam, total monitor units (MUs), beam on time (BOT) and gantry rotation time (GRT) were used and measured with TrueBeam{sup TM} STx and Surveillance And Measurement (SAM) 940 detector was used for photoneutron emitted by using 3F and 2F. To assess temporal and economical aspect for a patient, total treatment periods and medical fees were estimated. In using 3F beam, total MUs in IMRT plan increased the highest up to 34.0% and in the test of BOT, GRT and photoneutron, the values in SBRT plan decreased the lowest 39.8, 38.6 and 48.1%, respectively. In the temporal and economical aspect, there were no differences between 3F and 2F beam in all of plans and the results showed that 10 days and 169,560 won was lowest in SBRT plan. According as the results, total MUs increased by using 3F beam than 2F beam but BOT, GRT and photoneutron decreased. From above the results, using 3F beam can decrease intra-fraction setup error and risk of radiation-induced secondary malignancy. But, using 3F beam did not make the benefits of temporal and economical aspect for a patient with the radiation therapy.

  8. A suggested technique for the application of the cone beam computed tomography periapical index.

    Science.gov (United States)

    Esposito, S; Cardaropoli, M; Cotti, E

    2011-12-01

    Cone beam CT (CBCT) produces undistorted three-dimensional (3D) images of the maxillofacial region with a radiation dosage lower than conventional CT. The periapical index score (PAI) is commonly used to follow up the lesions in the bone using periapical radiographs. Recently, a new PAI based on CBCT was introduced (CBCT-PAI). The aim of this technical report is to present a modified reproducible method to assess the CBCT-PAI. CBCT was used to evaluate a periapical bone lesion observed in the area of tooth number 13 before treatment and 2 years after treatment. The modified CBCT-PAI was applied to both the examinations to measure the lesion. The dimensional analysis of the lesion was performed in each plane, assessing three fixed and reproducible dimensions: mesiodistal (M-D), buccolingual (B-L) and coronoapical (C-A). The images were evaluated by three mutually independent examiners. Data were collected and reported in a chart. The results were compared with each other and with the PAI score from the periapical radiographs. The three observers reported the same measurements of the lesion for each plane. The CBCT-PAI follow-up showed a reduction of the size of the lesion (5D vs 4D) but also an increase in the erosion of the buccal cortical plate. The comparison of CBCT-PAI with classic PAI showed the first method to be more precise. This technical report shows how the CBCT-PAI can be applied to the CBCT exam of a periapical lesion in a reproducible way.

  9. Transport of Sputtered Particles in Capacitive Sputter Sources

    CERN Document Server

    Trieschmann, Jan

    2015-01-01

    The transport of sputtered aluminum inside a multi frequency capacitively coupled plasma chamber is simulated by means of a kinetic test multi-particle approach. A novel consistent set of scattering parameters obtained for a modified variable hard sphere collision model is presented for both argon and aluminum. An angular dependent Thompson energy distribution is fitted to results from Monte-Carlo simulations and used for the kinetic simulation of the transport of sputtered aluminum. For the proposed configuration the transport of sputtered particles is characterized under typical process conditions at a gas pressure of p = 0.5 Pa. It is found that - due to the peculiar geometric conditions - the transport can be understood in a one dimensional picture, governed by the interaction of the imposed and backscattered particle fluxes. It is shown that the precise geometric features play an important role only in proximity to the electrode edges, where the effect of backscattering from the outside chamber volume be...

  10. Elementary surface processes during reactive magnetron sputtering of chromium

    Energy Technology Data Exchange (ETDEWEB)

    Monje, Sascha; Corbella, Carles, E-mail: carles.corbella@rub.de; Keudell, Achim von [Research Group Reactive Plasmas, Ruhr-University Bochum, Universitystr. 150, 44801 Bochum (Germany)

    2015-10-07

    The elementary surface processes occurring on chromium targets exposed to reactive plasmas have been mimicked in beam experiments by using quantified fluxes of Ar ions (400–800 eV) and oxygen atoms and molecules. For this, quartz crystal microbalances were previously coated with Cr thin films by means of high-power pulsed magnetron sputtering. The measured growth and etching rates were fitted by flux balance equations, which provided sputter yields of around 0.05 for the compound phase and a sticking coefficient of O{sub 2} of 0.38 on the bare Cr surface. Further fitted parameters were the oxygen implantation efficiency and the density of oxidation sites at the surface. The increase in site density with a factor 4 at early phases of reactive sputtering is identified as a relevant mechanism of Cr oxidation. This ion-enhanced oxygen uptake can be attributed to Cr surface roughening and knock-on implantation of oxygen atoms deeper into the target. This work, besides providing fundamental data to control oxidation state of Cr targets, shows that the extended Berg's model constitutes a robust set of rate equations suitable to describe reactive magnetron sputtering of metals.

  11. Review of strategies for a comprehensive simulation in sputtering devices

    CERN Document Server

    Gentile, Antonio A

    2012-01-01

    The development of sputtering facilities, at the moment, is mainly pursued through experimental tests, or simply by expertise in the field, and relies much less on numerical simulation of the process environment. This leads to great efforts and empirically, roughly optimized solutions: in fact, the simulation of these devices, at the state of art, is quite good in predicting the behavior of single steps of the overall deposition process, but it seems still ahead a full integration among the tools simulating the various phenomena involved in a sputter. We summarize here the techniques and codes already available for problems of interest in sputtering facilities, and we try to outline the possible features of a comprehensive simulation framework. This framework should be able to integrate the single paradigms, dealing with aspects going from the plasma environment up to the distribution and properties of the deposited film, not only on the surface of the substrate, but also on the walls of the process chamber.

  12. Sputtering of a silicon surface: Preferential sputtering of surface impurities

    Energy Technology Data Exchange (ETDEWEB)

    Nietiadi, Maureen L. [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany); Rosandi, Yudi [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany); Department of Physics, Universitas Padjadjaran, Jatinangor, Sumedang 45363 (Indonesia); Lorinčík, Jan [Faculty of Science, J. E. Purkinje University, České mládeže 8, 400 96 Ústí nad Labem (Czech Republic); Institute of Photonics and Electronics, Academy of Sciences of the Czech Republic, Chaberská 57, 182 51 Praha (Czech Republic); Urbassek, Herbert M., E-mail: urbassek@rhrk.uni-kl.de [Physics Department and Research Center OPTIMAS, University Kaiserslautern, Erwin-Schrödinger-Straße, D-67663 Kaiserslautern (Germany)

    2013-05-15

    We present molecular-dynamics simulations of the sputtering of an impurity atom off a Si 2×1 (100) surface by 2 keV Ar ions. The impurity is characterized by its mass and its binding energy to the Si substrate. We find that sputtering strongly decreases with the mass and even more strongly with the binding energy of the impurity atom to the matrix. The velocity of the impurity perpendicular to the surface is reduced with increasing impurity mass and binding energy. In terms of available ionization theories we can conclude that heavier impurities will have a smaller ionization probability.

  13. Measuring permeability, Young's modulus, and stress relaxation by the beam-bending technique

    Science.gov (United States)

    Vichit-Vadakan, Wilasa

    Recent interest in the permeability of cement paste, mortars, and concrete lies in the need to gain further understanding of mechanisms affecting the durability of these materials. Conventional techniques for measuring permeability are cumbersome and often take days to complete just one measurement. This thesis proposes a new technique for measuring the permeability. The advantage of this technique is that the results are obtained in a few minutes to a few hours; moreover, there is no problem with leaks or need for high pressures. The method is particularly well suited for examining the changes in permeability and viscoelastic properties of young cement paste samples. When a saturated rod of a porous material is instantaneously deflected under three-point bending, two types of relaxation processes occur simultaneously: hydrodynamic relaxation, caused by the flow of liquid in the porous body to restore ambient pressure, and viscoelastic relaxation of the solid network. By measuring the decrease in the force required to sustain a constant deflection, it is possible to obtain the permeability and Young's modulus from the hydrodynamic relaxation function, in addition to the stress relaxation function of the sample. The exact viscoelastic solution is developed and the total relaxation is shown to be very closely approximated as the product of the hydrodynamic and stress relaxation functions. The analytical results are verified on porous VycorRTM glass saturated in various solvents, including normal alcohols, water, and glycerol. The results show excellent agreement with the theory. Consistent with observations of previous workers, the permeability is found to be influenced by the size of the solvent molecule; by assuming that the pore surfaces are covered with a monolayer of immobile solvent, the observed variation can be explained. The evolution of the permeability, Young's modulus, and stress relaxation function are reported for Type III Portland cement paste with

  14. A new formula for sputtering yield as function of ion energies at normal incidence

    Science.gov (United States)

    Grais, Kh. I.; Shaltout, A. A.; Ali, S. S.; Boutros, R. M.; El-behery, K. M.; El-Sayed, Z. A.

    2010-04-01

    The statistical ellipsoidal construction has been reconstructed into the statistical conicoidal construction, to describe the sputtering yield, at normal incidence, for various ion energies. The most important advantage of the new volume is the developing of a simple-single equation to describe the sputtering-energy relationship. Its parameters have been pictorially predicted from the conicoidal representation. A correction term [1-( E th/E i) 1/ Ω] was added to the present new equation to describe the threshold energy ( E th) of sputtering. The developed equation could be applied to all available ion/target combinations, over a broadened range of energy for low and heavy ion-masses. The new equation has been differentiated with respect to energy giving rise to a relation between the threshold energy and maximum energy, at which the maximum sputtering yield occurs. It was found that, the obtained theoretical sputtering data for low and heavy ions satisfactorily approaches the available experimental data and works well at the threshold regime. It should be mentioned that the conicoidal model is not only of interest for analytical glow discharge method but also for ion beam method for the sputtering process, where low and high sputtering values could occur.

  15. A novel technique for injecting and extracting beams in a circular hadron accelerator without using septum magnets

    CERN Document Server

    AUTHOR|(SzGeCERN)395725

    2015-01-01

    With a few exceptions, all on-axis injection and extraction schemes implemented in circular particle accelerators, synchrotrons, and storage rings, make use of magnetic and electrostatic septa with systems of slow-pulsing dipoles acting on tens of thousands of turns and fast-pulsing dipoles on just a few. The dipoles create a closed orbit deformation around the septa, usually referred to as an orbit bump. A new approach is presented which obviates the need for the septum deflectors. Fastpulsing elements are still required, but their strength can be minimized by choosing appropriate local accelerator optics. This technique should increase the beam clearance and reduce the usually high radiation levels found around the septa and also reduce the machine impedance introduced by the fast-pulsing dipoles. The basis of the technique is the creation of stable islands around stable fixed points in horizontal phase space. The trajectories of these islands may then be adjusted to match the position and angle of the inco...

  16. Structural and optical properties of Zn1−xNixTe thin films prepared by electron beam evaporation technique

    Directory of Open Access Journals (Sweden)

    Arshad Mahmood

    2015-02-01

    Full Text Available Zn1−xNixTe thin films with different composition (x=0.0, 0.05, 0.10, 0.15 and 0.20 were deposited on glass substrate by electron beam evaporation technique followed by its characterization using advanced structural and optical analysis techniques. Structural properties of the prepared thin films were studied by X-ray diffraction (XRD. The XRD patterns revealed that the binary compounds transformed into a ternary compound with cubic structure having preferred orientation along the c-direction with (111 planes. Composition analysis of the films was determined by energy dispersive analysis of X-rays (EDAX and found to be in agreement with the precursor composition. Optical properties such as extinction coefficient (k and band gap energy of these films were examined by using a spectroscopic ellipsometer. It was found that the extinction coefficient (k increased with the addition of Ni content in the alloy. In comparison, the band gap energy was also determined by using transmission spectra and found to be agreed with that of the ellipsometric results. These analyses confirm that the band gap energy decreases with the increase of Ni content in the alloy.

  17. Polyester fabric coated with Ag/ZnO composite film by magnetron sputtering

    Science.gov (United States)

    Yuan, Xiaohong; Xu, Wenzheng; Huang, Fenglin; Chen, Dongsheng; Wei, Qufu

    2016-12-01

    Ag/ZnO composite film was successfully deposited on polyester fabric by using direct current (DC) magnetron sputtering and radio frequency (RF) magnetron reaction sputtering techniques with pure silver (Ag) and zinc (Zn) targets. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were used to examine the deposited film on the fabric. It was found that the zinc film coated on Ag film before RF reactive sputtering could protect the silver film from oxidation. Anti-ultraviolet property and antistatic property of the coated samples using different magnetron sputtering methods were also investigated. The experimental results showed that Ag film was oxidized into in Ag2O film in high vacuum oxygen environment. The deposition of Zn film on the surface of the fabric coated with Ag film before RF reactive sputtering, could successfully obtained Ag/ZnO composite film, and also generated structural color on the polyester fabric.

  18. Effect of sputtering pressure on some properties of chromium thin films obliquely deposited

    Energy Technology Data Exchange (ETDEWEB)

    Besnard, A; Martin, N; Millot, C; Gavoille, J; Salut, R, E-mail: aurelien.besnard@ens2m.fr [Institut FEMTO-ST, UMR 6174 CNRS, Universite de Franche-Comte, ENSMM, UTBM, 32 avenue de l' observatoire, 25044 Besancon (France)

    2010-06-15

    Oriented columnar thin films provide a wide range of new properties linked to the large panel of available microstructures. The efficiency of the technique and thus the resulting structure, based on an incident flux of particles impinging on the substrate, depends on the distribution of the vapour source. The deposition pressure, which acts on the sputtered particles mean free path, is an important parameter, especially for sputtering processes. This study reports on the effect of different deposition pressures combined to a systematic change of the incidence angle of the sputtered particles, on the structural properties and electrical behaviours of obliquely sputtered chromium thin films. The results revealed higher performances and an enhanced control of the process at low sputtering pressure.

  19. Surface charging of thick porous water ice layers relevant for ion sputtering experiments

    Science.gov (United States)

    Galli, A.; Vorburger, A.; Pommerol, A.; Wurz, P.; Jost, B.; Poch, O.; Brouet, Y.; Tulej, M.; Thomas, N.

    2016-07-01

    We use a laboratory facility to study the sputtering properties of centimeter-thick porous water ice subjected to the bombardment of ions and electrons to better understand the formation of exospheres of the icy moons of Jupiter. Our ice samples are as similar as possible to the expected moon surfaces but surface charging of the samples during ion irradiation may distort the experimental results. We therefore monitor the time scales for charging and discharging of the samples when subjected to a beam of ions. These experiments allow us to derive an electric conductivity of deep porous ice layers. The results imply that electron irradiation and sputtering play a non-negligible role for certain plasma conditions at the icy moons of Jupiter. The observed ion sputtering yields from our ice samples are similar to previous experiments where compact ice films were sputtered off a micro-balance.

  20. Laser surface annealing technique of aged Inconel 718 by laser beam irradiation

    Science.gov (United States)

    Liu, Liufa; Hirose, Akio; Kobayashi, Kojiro F.

    2003-03-01

    Laser was employed to anneal a thin surface layer of aged Inconel 718 by dissolving the strengthening phase, γ". The HE (Hydrogen Embrittlement) resistance of the alloy was improved via such laser surface annealing (LSA) processes. To establish a general LSA technique for engineer applications, experimental LSA processes were conducted to study the effects of the laser process parameters on the formation of the annealed surface layers, and applicable process parameter ranges were obtained. Next, a numerical method was developed for predicting the formation of the laser annealed surface layers in the following steps. Because only the γ" phase was dissolved in the LSA process, the dissolution kinetics of this phase was studied via thermal cycling experiments, and it was proved to follow an Avrami equation. FEM (Finite Element Method) simulations were conducted to calculate the thermal distribution in each laser annealed surface layer, and thermal history data were extracted every certain depth. The volume fractions of the γ" phase at these depths were calculated using these thermal history data based on the deduced Avrami equation. Using a developed relationship between the hardness variation of the alloy and the volume fraction variation of the γ" phase, the hardness distribution in the annealed surface layer and this layer's thickness were calculated. The predicted applicable laser process parameter ranges were obtained. These calculated results were compared with their corresponding experimental results. The good agreements between the calculated and measured results suggested that this numerical prediction approach is feasible for engineer applications.

  1. Nondestructive atomic compositional analysis of BeMgZnO quaternary alloys using ion beam analytical techniques

    Energy Technology Data Exchange (ETDEWEB)

    Zolnai, Z., E-mail: zolnai.zsolt@ttk.mta.hu [Research Centre for Natural Sciences, Institute of Technical Physics and Materials Science (MFA), Konkoly-Thege M. út 29-33, H-1121 Budapest (Hungary); Toporkov, M. [Department of Electrical and Computer Engineering, Virginia Commonwealth University, 601W Main St, Richmond, VA 23284 (United States); Volk, J. [Research Centre for Natural Sciences, Institute of Technical Physics and Materials Science (MFA), Konkoly-Thege M. út 29-33, H-1121 Budapest (Hungary); Department of Electrical and Computer Engineering, Virginia Commonwealth University, 601W Main St, Richmond, VA 23284 (United States); Demchenko, D.O. [Department of Physics, Virginia Commonwealth University, 701W. Grace St., Richmond, VA 23284 (United States); Okur, S. [Department of Electrical and Computer Engineering, Virginia Commonwealth University, 601W Main St, Richmond, VA 23284 (United States); Szabó, Z. [Research Centre for Natural Sciences, Institute of Technical Physics and Materials Science (MFA), Konkoly-Thege M. út 29-33, H-1121 Budapest (Hungary); Özgür, Ü.; Morkoç, H.; Avrutin, V. [Department of Electrical and Computer Engineering, Virginia Commonwealth University, 601W Main St, Richmond, VA 23284 (United States); Kótai, E. [Wigner Research Centre for Physics, Institute for Particle and Nuclear Physics, Konkoly-Thege M. út 29-33, H-1121 Budapest (Hungary)

    2015-02-01

    Highlights: • BeMgZnO thin layers were grown with plasma-assisted molecular beam epitaxy (MBE). • The Be contents were accurately measured with RBS and proton elastic backscattering. • The Tauc bandgap was measured from optical transmittance experiments. • The bandgap has been varied between 3.26 eV and 4.62 eV via the Be and Mg content. • Experimental and density functional theory calculated bandgaps were in good agreement. - Abstract: The atomic composition with less than 1–2 atom% uncertainty was measured in ternary BeZnO and quaternary BeMgZnO alloys using a combination of nondestructive Rutherford backscattering spectrometry with 1 MeV He{sup +} analyzing ion beam and non-Rutherford elastic backscattering experiments with 2.53 MeV energy protons. An enhancement factor of 60 in the cross-section of Be for protons has been achieved to monitor Be atomic concentrations. Usually the quantitative analysis of BeZnO and BeMgZnO systems is challenging due to difficulties with appropriate experimental tools for the detection of the light Be element with satisfactory accuracy. As it is shown, our applied ion beam technique, supported with the detailed simulation of ion stopping, backscattering, and detection processes allows of quantitative depth profiling and compositional analysis of wurtzite BeZnO/ZnO/sapphire and BeMgZnO/ZnO/sapphire layer structures with low uncertainty for both Be and Mg. In addition, the excitonic bandgaps of the layers were deduced from optical transmittance measurements. To augment the measured compositions and bandgaps of BeO and MgO co-alloyed ZnO layers, hybrid density functional bandgap calculations were performed with varying the Be and Mg contents. The theoretical vs. experimental bandgaps show linear correlation in the entire bandgap range studied from 3.26 eV to 4.62 eV. The analytical method employed should help facilitate bandgap engineering for potential applications, such as solar blind UV photodetectors and

  2. A novel technique for VMAT QA with EPID in cine mode on a Varian TrueBeam linac

    Science.gov (United States)

    Liu, Bo; Adamson, Justus; Rodrigues, Anna; Zhou, Fugen; Yin, Fang-fang; Wu, Qiuwen

    2013-10-01

    Volumetric modulated arc therapy (VMAT) is a relatively new treatment modality for dynamic photon radiation therapy. Pre-treatment quality assurance (QA) is necessary and many efforts have been made to apply electronic portal imaging device (EPID)-based IMRT QA methods to VMAT. It is important to verify the gantry rotation speed during delivery as this is a new variable that is also modulated in VMAT. In this paper, we present a new technique to perform VMAT QA using an EPID. The method utilizes EPID cine mode and was tested on Varian TrueBeam in research mode. The cine images were acquired during delivery and converted to dose matrices after profile correction and dose calibration. A sub-arc corresponding to each cine image was extracted from the original plan and its portal image prediction was calculated. Several analyses were performed including 3D γ analysis (2D images + gantry angle axis), 2D γ analysis, and other statistical analyses. The method was applied to 21 VMAT photon plans of 3 photon energies. The accuracy of the cine image information was investigated. Furthermore, this method's sensitivity to machine delivery errors was studied. The pass rate (92.8 ± 1.4%) for 3D γ analysis was comparable to those from Delta4 system (99.9 ± 0.1%) under similar criteria (3%, 3 mm, 5% threshold and 2° angle to agreement) at 6 MV. The recorded gantry angle and start/stop MUs were found to have sufficient accuracy for clinical QA. Machine delivery errors can be detected through combined analyses of 3D γ, gantry angle, and percentage dose difference. In summary, we have developed and validated a QA technique that can simultaneously verify the gantry angle and delivered MLC fluence for VMAT treatment.This technique is efficient and its accuracy is comparable to other QA methods.

  3. A novel technique for VMAT QA with EPID in cine mode on a Varian TrueBeam linac.

    Science.gov (United States)

    Liu, Bo; Adamson, Justus; Rodrigues, Anna; Zhou, Fugen; Yin, Fang-fang; Wu, Qiuwen

    2013-10-07

    Volumetric modulated arc therapy (VMAT) is a relatively new treatment modality for dynamic photon radiation therapy. Pre-treatment quality assurance (QA) is necessary and many efforts have been made to apply electronic portal imaging device (EPID)-based IMRT QA methods to VMAT. It is important to verify the gantry rotation speed during delivery as this is a new variable that is also modulated in VMAT. In this paper, we present a new technique to perform VMAT QA using an EPID. The method utilizes EPID cine mode and was tested on Varian TrueBeam in research mode. The cine images were acquired during delivery and converted to dose matrices after profile correction and dose calibration. A sub-arc corresponding to each cine image was extracted from the original plan and its portal image prediction was calculated. Several analyses were performed including 3D γ analysis (2D images + gantry angle axis), 2D γ analysis, and other statistical analyses. The method was applied to 21 VMAT photon plans of 3 photon energies. The accuracy of the cine image information was investigated. Furthermore, this method's sensitivity to machine delivery errors was studied. The pass rate (92.8 ± 1.4%) for 3D γ analysis was comparable to those from Delta(4) system (99.9 ± 0.1%) under similar criteria (3%, 3 mm, 5% threshold and 2° angle to agreement) at 6 MV. The recorded gantry angle and start/stop MUs were found to have sufficient accuracy for clinical QA. Machine delivery errors can be detected through combined analyses of 3D γ, gantry angle, and percentage dose difference. In summary, we have developed and validated a QA technique that can simultaneously verify the gantry angle and delivered MLC fluence for VMAT treatment.This technique is efficient and its accuracy is comparable to other QA methods.

  4. 高电荷态重离子束流产生技术的研究%Technique of Producing High Charge State Heavy-ion Beam

    Institute of Scientific and Technical Information of China (English)

    高丽娟; 范辉; 蔡莉; 王惠; 史淑廷; 郭刚; 刘建成; 陈泉; 沈东军; 惠宁; 王贵良; 孔福全

    2014-01-01

    In order to get the Beijing HI-13 tandem accelerator beam with the higher range and LET in silicon , the techniques of beam route simulating and pico-ampere beam diagnosing were developed .The magnetic rigidity simulation and electric rigidity simulation techniques combined with beam spot observing and beam intensity measuring techniques were used for getting 360 MeV 197 Au ion beam with the peak-to-total ratio of 80% in the spectrum .The range of 360 MeV 197 Au in silicon is 30.1μm and the LET is 86.1 MeV · cm2 · mg -1 .This meets the requirement of single-event effect test ,and the beam energy range and LET range in Beijing HI-13 tandem accelerator have been obvi-ously enlarged .%为了提高北京HI-13串列加速器束流的硅中射程和LET 值,本文开展了高电荷态束流引出技术及pA级弱束流诊断技术研究。采用电刚度和磁刚度模拟技术,配合pA级弱束流束斑观测和束流强度监测技术,获得能量360 MeV、峰总比80%的197 Au离子束流,其在Si中的表面LET为86.1 MeV · cm2· mg -1、射程为30.1μm ,满足单粒子效应(SEE)实验的要求,拓展了北京 HI-13串列加速器上单粒子效应实验所用离子的能量和LET值范围。

  5. Study on the interaction between different solute molecules in a molecular beam produced by the spray-jet technique: an application to dendrimer/dye system

    Science.gov (United States)

    Yamada, Toshiki; Ge, Maofa; Shinohara, Hidenori; Kimura, Katsumi; Mashiko, Shinro

    2003-10-01

    We report on an investigation into the interaction between different neutral non-volatile solute molecules in a molecular beam produced by the spray-jet technique that enables us to produce a molecular beam from a sprayed mist of a sample solution. This technique is applied to poly(propylene imine) dendrimer and 4-dicyanomethylene-2-methyl-6- p-dimethylaminostyryl-4H-pyran (DCM) systems. Resonantly enhanced multiphoton ionization of DCM in the DCM/dendrimer molecular beam leads to an efficient reaction between the dendrimer and DCM. The REMPI excitation spectra provide insights into the interaction between DCM and dendrimer molecules in the gas phase for the first time in these experiments.

  6. Bone bonding strength of diamond-structured porous titanium-alloy implants manufactured using the electron beam-melting technique

    Energy Technology Data Exchange (ETDEWEB)

    Hara, Daisuke [Department of Orthopaedic Surgery, Graduate School of Medical Sciences, Kyushu University, 3-1-1 Maidashi, Higashi-ku, Fukuoka 812-8582 (Japan); Nakashima, Yasuharu, E-mail: yasunaka@ortho.med.kyushu-u.ac.jp [Department of Orthopaedic Surgery, Graduate School of Medical Sciences, Kyushu University, 3-1-1 Maidashi, Higashi-ku, Fukuoka 812-8582 (Japan); Sato, Taishi; Hirata, Masanobu; Kanazawa, Masayuki; Kohno, Yusuke; Yoshimoto, Kensei [Department of Orthopaedic Surgery, Graduate School of Medical Sciences, Kyushu University, 3-1-1 Maidashi, Higashi-ku, Fukuoka 812-8582 (Japan); Yoshihara, Yusuke [Research Department, Kyocera Medical Corporation, 3-3-31, Miyahara, Yodogawa-ku, Osaka 532-0003 (Japan); Nakamura, Akihiro [Design & Development Department, Kyocera Medical Corporation, 3-3-31, Miyahara, Yodogawa-ku, Osaka, 532-0003 (Japan); Nakao, Yumiko [Research Department, Kyocera Medical Corporation, 3-3-31, Miyahara, Yodogawa-ku, Osaka 532-0003 (Japan); Iwamoto, Yukihide [Department of Orthopaedic Surgery, Graduate School of Medical Sciences, Kyushu University, 3-1-1 Maidashi, Higashi-ku, Fukuoka 812-8582 (Japan)

    2016-02-01

    The present study examined the bone bonding strength of diamond-structured porous titanium-alloy (Porous-Ti-alloy) manufactured using the electron beam-melting technique in comparison with fiber mesh-coated or rough-surfaced implants. Cylindrical implants with four different pore sizes (500, 640, 800, and 1000 μm) of Porous-Ti-alloy, titanium fiber mesh (FM), and surfaces roughened by titanium arc spray (Ti-spray) were implanted into the distal femur of rabbits. Bone bonding strength and histological bone ingrowth were evaluated at 4 and 12 weeks after implantation. The bone bonding strength of Porous-Ti-alloy implants (640 μm pore size) increased over time from 541.4 N at 4 weeks to 704.6 N at 12 weeks and was comparable to that of FM and Ti-spray implants at both weeks. No breakage of the porous structure after mechanical testing was found with Porous-Ti-alloy implants. Histological bone ingrowth that increased with implantation time occurred along the inner structure of Porous-Ti-alloy implants. There was no difference in bone ingrowth in Porous-Ti-alloy implants with pore sizes among 500, 640, and 800 μm; however, less bone ingrowth was observed with the 1000 μm pore size. These results indicated Porous-Ti-alloy implants with pore size under 800 μm provided biologically active and mechanically stable surface for implant fixation to bone, and had potential advantages for weight bearing orthopedic implants such as acetabular cups. - Highlights: • The electron beam-melting technique was applied for manufacturing Porous-Ti-alloy. • Bone bonding strength of Porous-Ti-alloy was comparable to that of FM/Ti-spray. • Mode of failure of Porous-Ti-alloy was consistently at the implant-bone interface. • Porous-Ti-alloy with 500–800 μm pore sizes showed the favorable bone ingrowth. • Porous-Ti-alloy provides a biologically active and mechanically stable surface.

  7. High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition

    Energy Technology Data Exchange (ETDEWEB)

    Anders, Andre

    2009-09-01

    High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage, without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

  8. Sputtering and crystalline structure modification of bismuth thin films deposited onto silicon substrates under the impact of 20-160 keV Ar{sup +} ions

    Energy Technology Data Exchange (ETDEWEB)

    Mammeri, S. [CRNA/Division des Techniques Nucleaires, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria); Ouichaoui, S., E-mail: souichaoui@gmail.co [USTHB/Faculte de Physique, B.P. 32, El-Alia, 16111 Bab Ezzouar, Algiers (Algeria); Ammi, H. [CRNA/Division des Techniques Nucleaires, B.P. 399, 02 Bd. Frantz Fanon, Alger-Gare, Algiers (Algeria); Zemih, R. [USTHB/Faculte de Physique, B.P. 32, El-Alia, 16111 Bab Ezzouar, Algiers (Algeria)

    2010-01-15

    The sputtering of bismuth thin films induced by 20-160 keV Ar{sup +} ions has been studied using Rutherford backscattering spectrometry, scanning electron microscopy and X-ray energy dispersive and diffraction spectroscopy. These techniques revealed increasing modifications of the Bi film surfaces with increasing both ion beam energy and fluence up to their complete deterioration under irradiation conditions E = 160 keV and phi = 1.5 x 10{sup 16} cm{sup -2}, leaving isolated islands of preferred (0 1 2) orientation on the Si substrate. The observed surface morphology and crystalline structure evolutions are likely due to a complex interplay of interaction mechanisms involving both elastic nuclear collisions and inelastic electronic ones. The measured Bi sputtering yields versus Ar{sup +} ion fluence for a fixed ion energy exhibit a significant depression at very low phi-values followed by a steady state regime above approx2.0 x 10{sup 14} cm{sup -2}. Measured sputtering yields versus Ar{sup +} ion energy with fixing ion fluence to 1.2 x 10{sup 16} cm{sup -2} in the upper part of the yield saturation regime are also reported. Their comparison to theoretical model and SRIM 2008 Monte Carlo simulation predictions is discussed.

  9. An innovative experimental setup for the measurement of sputtering yield induced by keV energy ions

    Energy Technology Data Exchange (ETDEWEB)

    Salou, P.; Lebius, H.; Benyagoub, A.; Langlinay, T.; Lelièvre, D.; Ban-d’Etat, B. [CIMAP (CEA-CNRS-ENSICAEN-UCBN), Boulevard Henri Becquerel, BP 5133, 14070 Caen Cedex 5 (France)

    2013-09-15

    An innovative experimental equipment allowing to study the sputtering induced by ion beam irradiation is presented. The sputtered particles are collected on a catcher which is analyzed in situ by Auger electron spectroscopy without breaking the ultra high vacuum (less than 10{sup −9} mbar), avoiding thus any problem linked to possible contamination. This method allows to measure the angular distribution of sputtering yield. It is now possible to study the sputtering of many elements such as carbon based materials. Preliminary results are presented in the case of highly oriented pyrolytic graphite and tungsten irradiated by an Ar{sup +} beam at 2.8 keV and 7 keV, respectively.

  10. Ion beam technology applications study. [ion impact, implantation, and surface finishing

    Science.gov (United States)

    Sellen, J. M., Jr.; Zafran, S.; Komatsu, G. K.

    1978-01-01

    Specific perceptions and possible ion beam technology applications were obtained as a result of a literature search and contact interviews with various institutions and individuals which took place over a 5-month period. The use of broad beam electron bombardment ion sources is assessed for materials deposition, removal, and alteration. Special techniques examined include: (1) cleaning, cutting, and texturing for surface treatment; (2) crosslinking of polymers, stress relief in deposited layers, and the creation of defect states in crystalline material by ion impact; and (3) ion implantation during epitaxial growth and the deposition of neutral materials sputtered by the ion beam. The aspects, advantages, and disadvantages of ion beam technology and the competitive role of alternative technologies are discussed.

  11. An anthropomorphic breathing phantom of the thorax for testing new motion mitigation techniques for pencil beam scanning proton therapy

    Science.gov (United States)

    Perrin, R. L.; Zakova, M.; Peroni, M.; Bernatowicz, K.; Bikis, C.; Knopf, A. K.; Safai, S.; Fernandez-Carmona, P.; Tscharner, N.; Weber, D. C.; Parkel, T. C.; Lomax, A. J.

    2017-03-01

    Motion-induced range changes and incorrectly placed dose spots strongly affect the quality of pencil-beam-scanned (PBS) proton therapy, especially in thoracic tumour sites, where density changes are large. Thus motion-mitigation techniques are necessary, which must be validated in a realistic patient-like geometry. We report on the development and characterisation of a dynamic, anthropomorphic, thorax phantom that can realistically mimic thoracic motions and anatomical features for verifications of proton and photon 4D treatments. The presented phantom is of an average thorax size, and consists of inflatable, deformable lungs surrounded by a skeleton and skin. A mobile ‘tumour’ is embedded in the lungs in which dosimetry devices (such as radiochromic films) can be inserted. Motion of the tumour and deformation of the thorax is controlled via a custom made pump system driving air into and out of the lungs. Comprehensive commissioning tests have been performed to evaluate the mechanical performance of the phantom, its visibility on CT and MR imaging and its feasibility for dosimetric validation of 4D proton treatments. The phantom performed well on both regular and irregular pre-programmed breathing curves, reaching peak-to-peak amplitudes in the tumour of  90% in the central planes of the target. The results of this study demonstrate that this anthropomorphic thorax phantom is suitable for imaging and dosimetric studies in a thoracic geometry closely-matched to lung cancer patients under realistic motion conditions.

  12. Postprostatectomy ultrasound-guided transrectal implantation of gold markers for external beam radiotherapy. Technique and complications rate

    Energy Technology Data Exchange (ETDEWEB)

    Langenhuijsen, J.F.; Kiemeney, L.A.L.M.; Witjes, J.A. [Radboud Univ. Nijmegen Medical Center, Nijmegen (Netherlands). Dept. of Urology; Donker, R. [Medical Center Alkmaar (Netherlands). Dept. of Radiation Oncology; McColl, G.M.; Lin, E.N.J.T. van [Radboud Univ. Nijmegen Medical Center, Nijmegen (Netherlands). Dept. of Radiation Oncology

    2013-06-15

    Background and purpose: Postprostatectomy radiotherapy (RT) improves survival in adjuvant and salvage settings. The implantation technique and complications rate of gold markers in the prostate bed for high-precision RT were analyzed. Patients and methods: Patients undergoing postprostatectomy RT for prostate-specific antigen (PSA) relapse or high-risk disease were enrolled in the study. Under transrectal ultrasound guidance, three fine gold markers were implanted in the prostate bed and the technical difficulties of insertion were documented. Patients received our self-designed questionnaires concerning complications and pain. The influence of anticoagulants and coumarins on bleeding was analyzed, as was the effect of potential risk factors on pain. Results: In 77 consecutive patients, failure of marker implantation or marker migration was seen in six cases. Rectal bleeding was reported by 10 patients and 1 had voiding complaints. No macroscopic hematuria persisting for more than 3 days was observed. Other complications included rectal discomfort (n = 2), nausea (n = 1), abdominal discomfort (n = 1), and pain requiring analgesics (n = 4). No major complications were reported. On a 0-10 visual analogue scale (VAS), the mean pain score was 3.7. No clinically significant risk factors for complications were identified. Conclusion: Transrectal implantation of gold markers in the prostate bed is feasible and safe. Alternatives like cone beam computed tomography (CBCT) should be considered, but the advantages of gold marker implantation for high-precision postprostatectomy RT would seem to outweigh the minor risks involved. (orig.)

  13. Trimming the electrical properties on nanoscale YBa2Cu3O7-x constrictions by focus ion beam technique

    Science.gov (United States)

    Lam, Simon K. H.; Bendavid, Avi; Du, Jia

    2017-09-01

    High temperature superconducting (HTS) nanostructure has a great potential in photon sensing at high frequency due to its fast recovery time. For maximising the coupling efficiency, the normal resistance of the nanostructure needs to be better matched to that of the thin-film antenna, which is typically few tens of ohm. We report on the fabrication of nanoscale high temperature superconducting YBa2Cu3O7-x (YBCO) constrictions using Gallium ion focus ion beam (FIB) technique. The FIB has been used to both remove the YBCO in lateral dimension and also tune its critical current and normal resistance by a combination of surface etching and implantation on the YBCO top layer. High critical current density of 2.5 MA/cm2 at 77 K can be obtained on YBCO nanobridges down to 100 nm in width. Subsequent trimming of the naobridges can lead to a normal resistance value over 50 Ω. Simulation of the Ga ion trajectory has also been performed to compare the measurement results. This method provides a simple step of fabricating nanoscale superconducting detectors such as hot electron bolometer.

  14. Positronium formation in NaY-zeolites studied by lifetime, positron beam Doppler broadening and 3-gamma detection techniques

    CERN Document Server

    Schut, H; Kolar, Z I; Veen, A V; Clet, G

    2000-01-01

    Results of positron annihilation measurements on NaY pressed powders and deposited thin films using slow positron beam and conventional fast positron techniques are presented. In lifetime experiments using an external sup sup 2 sup sup 2 Na source an averaged long lifetime of 1.8 ns with a sum intensity of 27% was observed in pressed powders in the presence of air at room temperature (RT). In literature this lifetime is ascribed to positrons annihilating in water filled alpha or beta cages Habrowska, A.M., Popiel, E.S., 1987. Positron annihilation in zeolite 13X. J. Appl. Phys. 62, 2419. By means of isotopic exchange some of the Na was replaced by sup sup 2 sup sup 2 Na. These powders showed a long lifetime component of 7-8 ns with an intensity increasing from 1 to 12% when heated under normal atmosphere from RT to 200 deg. C. No significant increase of the shorter (1.5 ns) lifetime was observed, while its intensity dropped from 13.4 to 6.6%. Both effects are ascribed to the loss of water from alpha cages onl...

  15. Electrochemical characterization of V{sub x}Nb{sub y}C{sub z}/Bi{sub x}Ti{sub y}O{sub z} coatings produced through thermo-reactive diffusion and the sputtering technique

    Energy Technology Data Exchange (ETDEWEB)

    Castro H, S. A.; Alfonso, J. E.; Olaya, J. J., E-mail: jealfonso@unal.edu.co [Universidad Nacional de Colombia, Departamento de Fisica, Grupo de Ciencia de Materiales y Superficies, AA-14490 Bogota (Colombia)

    2016-11-01

    We present and experimental study of the structural evolution of a bilayer V{sub x}Nb{sub y}C{sub z}/Bi{sub x}Ti{sub y}O{sub z} coating produced via thermo-reactive diffusion (TRD) and the RF sputtering process on D-2 steel substrate. The TRD treatments were carried out in a molten mixture consisting of borax, ferro-niobium, ferro-vanadium, and aluminum, at 1313 K for 3 hours, using a resistance-heating furnace. Bi{sub x}Ti{sub y}O{sub z} coatings were deposited using RF magnetron sputtering on TRD coatings, in order to carry out a study of the corrosion behavior of this compound. The crystallographic structure of the coatings was determined via X-ray diffraction, the corrosion resistance was analyzed through the potentiodynamic polarization test (Tafel Extrapolation) and electrochemical impedance spectroscopic analysis (EIS). X-ray diffraction patterns showed that the ternary coating (VNbC{sub 2}) was preferentially oriented along the [200] direction with a cubic-centered face structure, and the Bi{sub x}Ti{sub y}O{sub z} coatings were amorphous. The electrochemical studies showed that the resistance corrosion of the coatings increased with respect to the bare substrate, and that polarization resistance in the bilayer coatings increased with respect to the ternary coatings, suggesting that the titanate has anti corrosive barrier effects. (Author)

  16. Modeling target erosion during reactive sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Strijckmans, K., E-mail: Koen.Strijckmans@ugent.be; Depla, D.

    2015-03-15

    Highlights: • The erosion of a target is simulated with the RSD2013 software during reactive magnetron sputtering. • The influence of redeposition on the target state and on the hysteresis is explained. • The racetrack formation along the hysteresis and as function of the redeposition is quantified. • Comparison of the racetrack and the sputter profile shows clear differences. - Abstract: The influence of the reactive sputter conditions on the racetrack and the sputter profile for an Al/O{sub 2} DC reactive sputter system is studied by modeling. The role of redeposition, i.e. the deposition of sputtered material back on the target, is therefore taken into account. The used model RSD2013 is capable of simulating the effect of redeposition on the target condition in a spatial resolved way. Comparison between including and excluding redeposition in the RSD2013 model shows that the in-depth oxidation profile of the target differs. Modeling shows that it is important to distinguish between the formed racetrack, i.e. the erosion depth profile, and the sputter profile. The latter defines the distribution of the sputtered atoms in the vacuum chamber. As the target condition defines the sputter yield, it does determine the racetrack and the sputter profile of the planar circular target. Both the shape of the racetrack and the sputter profile change as function of the redeposition fraction as well as function of the oxygen flow change. Clear asymmetries and narrowing are observed for the racetrack shape. Similar effects are noticed for the sputter profile but to a different extent. Based on this study, the often heard misconception that the racetrack shape defines the distribution of the sputtered atoms during reactive sputtering is proven to be wrong.

  17. Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

    Energy Technology Data Exchange (ETDEWEB)

    Chan, K.-Y. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)], E-mail: k.y.chan@fz-juelich.de; Luo, P.-Q.; Zhou, Z.-B. [Department of Physics, Shanghai Jiao Tong University, 800 Dongchuan Road, 200240 Shanghai (China); Tou, T.-Y.; Teo, B.-S. [Thin Film Laboratory, Faculty of Engineering, Multimedia University, Jalan Multimedia, 63100 Cyberjaya, Selangor (Malaysia)

    2009-03-01

    Physical vapor processes using glow plasma discharge are widely employed in microelectronic industry. In particular magnetron sputtering is a major technique employed for the coating of thin films. This paper addresses the influence of direct current (DC) plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper (Cu) thin films coated on silicon substrates. The influence of the sputtering parameters including DC plasma power and argon working gas pressure on the electrical and structural properties of the thin Cu films was investigated by means of surface profilometer, four-point probe and atomic force microscopy.

  18. Subsea Target Measurement Technique of High Resolution Multi-Beam Sonar System -A Case Study of Ocean Oil & Gas Production Platform and Pipeline Detection

    Science.gov (United States)

    Ding, J.; Tang, Q.; Zhou, X.

    2015-12-01

    Abstract: with fast development of modern science and technology, subsea pipeline detection means have been increasingly improved which have not only improved detection efficiency, but also extremely advanced the detection precision. The article has integrated the performance characteristics of high resolution multi-beam measurement system in recent years, which has introduced the relevant technique and detection achievement of subsea pipeline detecting (especially for exposed pipeline) by detection cases. The final detection result has been verified that high resolution multi-beam measurement system could accurately detect subsea minisize target object, which has provided the technical reference with popularization and application of new characteristics.

  19. Development and validation of a hybrid simulation technique for cone beam CT: application to an oral imaging system

    Science.gov (United States)

    Zhang, G.; Pauwels, R.; Marshall, N.; Shaheen, E.; Nuyts, J.; Jacobs, R.; Bosmans, H.

    2011-09-01

    This paper proposes a hybrid technique to simulate the complete chain of an oral cone beam computed tomography (CBCT) system for the study of both radiation dose and image quality. The model was developed around a 3D Accuitomo 170 unit (J Morita, Japan) with a tube potential range of 60-90 kV. The Monte Carlo technique was adopted to simulate the x-ray generation, filtration and collimation. Exact dimensions of the bow-tie filter were estimated iteratively using experimentally acquired flood images. Non-flat radiation fields for different exposure settings were mediated via 'phase spaces'. Primary projection images were obtained by ray tracing at discrete energies and were fused according to the two-dimensional energy modulation templates derived from the phase space. Coarse Monte Carlo simulations were performed for scatter projections and the resulting noisy images were smoothed by Richardson-Lucy fitting. Resolution and noise characteristics of the flat panel detector were included using the measured modulation transfer function (MTF) and the noise power spectrum (NPS), respectively. The Monte Carlo dose calculation was calibrated in terms of kerma free-in-air about the isocenter, using an ionization chamber, and was subsequently validated by comparison against the measured air kerma in water at various positions of a cylindrical water phantom. The resulting dose discrepancies were found <10% for most cases. Intensity profiles of the experimentally acquired and simulated projection images of the water phantom showed comparable fractional increase over the common area as changing from a small to a large field of view, suggesting that the scatter was accurately accounted. Image validation was conducted using two small phantoms and the built-in quality assurance protocol of the system. The reconstructed simulated images showed high resemblance on contrast resolution, noise appearance and artifact pattern in comparison to experimentally acquired images, with <5

  20. Particle contamination formation and detection in magnetron sputtering processes

    Energy Technology Data Exchange (ETDEWEB)

    Selwyn, G.S. [Los Alamos National Lab., NM (United States); Weiss, C.A. [Materials Research Corp., Congers, NY (United States). Sputtering Systems Div.; Sequeda, F.; Huang, C. [Seagate Peripherals Disk Div., Milpitas, CA (United States)

    1996-10-01

    Defects caused by particulate contamination are an important concern in the fabrication of thin film products. Often, magnetron sputtering processes are used for this purpose. Particle contamination can cause electrical shorting, pin holes, problems with photolithography, adhesion failure, as well as visual and cosmetic defects. Particle contamination generated during thin film processing can be detected using laser light scattering, a powerful diagnostic technique that provides real-time, {ital in-situ} imaging of particles > 0.3 {mu}m in diameter. Using this technique, the causes, sources and influences on particles in plasma and non-plasma and non-plasma processes may be independently evaluated and corrected. Several studies employing laser light scattering have demonstrated both homogeneous and heterogeneous causes of particle contamination. In this paper, we demonstrate that the mechanisms for particle generation, transport and trapping during magnetron sputter deposition are different from the mechanisms reported in previously studied plasma etch processes. During magnetron sputter deposition, one source of particle contamination is linked to portions of the sputtering target surface exposed to weaker plasma density. In this region, film redeposition is followed by filament or nodule growth and enhanced trapping which increases filament growth. Eventually the filaments effectively ``short circuit`` the sheath, causing high currents to flow through these features. This, in turn, causes heating failure of the filament fracturing and ejecting the filaments into the plasma and onto the substrate. Evidence of this effect has been observed in semiconductor (IC) fabrication and storage disk manufacturing. Discovery of this mechanism in both technologies suggests that this mechanism may be universal to many sputtering processes.

  1. Reactive sputtering deposition of SiO2 thin films

    Directory of Open Access Journals (Sweden)

    IVAN RADOVIC

    2008-01-01

    Full Text Available SiO2 layers were deposited in a UHV chamber by 1 keV Ar+ ion sputtering from a high purity silicon target, using different values of the oxygen partial pressure (5×10-6–2×10-4 mbar and of the ion beam current on the target (1.67–6.85 mA. The argon partial pressure during operation of the ion gun was 1×10-3 mbar. The substrate temperature was held at 550 °C and the films were deposited to a thickness of 12.5–150 nm, at a rate from 0.0018–0.035 nm s-1. Structural characterization of the deposited thin films was performed by Rutherford backscattering spectrometry (RBS analysis. Reactive sputtering was proved to be efficient for the deposition of silica at 550 °C, an oxygen partial pressure of 2×10-4 mbar (ion beam current on the target of 5 mA or, at a lower deposition rate, ion beam current of 1.67 mA and an oxygen partial pressure of 6×10-5 mbar. One aspect of these investigations was to study the consumption of oxygen from the gas cylinder, which was found to be lower for higher deposition rates.

  2. Sodium tungsten bronze thin films by rf sputtering

    Energy Technology Data Exchange (ETDEWEB)

    Anderegg, J.W.

    1977-03-01

    Polycrystalline Na/sub x/WO/sub 3/ films were produced by rf sputtering. Films of low x-value resulted when co-sputtering WO/sub 3/ on a Na/sub 0.83/WO/sub 3/ target, and Na/sub 0/./sub 83/ on WO/sub 3/ target. Films of high x and of mixed phase were produced by sputtering a powder mixture of Na/sub 2/WO/sub 4/ and WO/sub 3/ on a tungsten target. Of the sputtering parameters studied, the substrate temperature is the most critical with temperatures above 500/sup 0/C producing films which were cubic in structure with only a small amount of Tetragonal I. The presence of oxygen up to 3 percent by volume had minimal effect on film quality or x-value. Auger, electron microprobe, SIMS, SEM, x-ray diffraction, and sheet resistivity techniques were used in characterizing these films. Resistivity of the films was a factor of 10 higher than the bulk crystalline data for Na/sub 0/./sub 83/WO/sub 3/.

  3. Hydrodynamic approach to surface pattern formation by ion beams

    Energy Technology Data Exchange (ETDEWEB)

    Castro, Mario, E-mail: marioc@upcomillas.es [Grupo Interdisciplinar de Sistemas Complejos (GISC) and Grupo de Dinamica No Lineal (DNL), Escuela Tecnica Superior de Ingenieri a - ICAI, Universidad Pontificia Comillas, E-28015 Madrid (Spain); Cuerno, Rodolfo [Departamento de Matematicas and GISC, Universidad Carlos III de Madrid, Avenida de la Universidad 30, E-28911 Leganes (Spain)

    2012-02-15

    On the proper timescale, amorphous solids can flow. Solid flow can be observed macroscopically in glaciers or lead pipes, but it can also be artificially enhanced by creating defects. Ion Beam Sputtering (IBS) is a technique in which ions with energies in the 0.110 keV range impact against a solid target inducing defect creation and dynamics, and eroding its surface leading to formation of ordered nanostructures. Despite its technological interest, a basic understanding of nanopattern formation processes occurring under IBS of amorphizable targets has not been clearly established, recent experiments on Si having largely questioned knowledge accumulated during the last two decades. A number of interfacial equations have been proposed in the past to describe these phenomena, typically by adding together different contributions coming from surface diffusion, ion sputtering or mass redistribution, etc. in a non-systematic way. Here, we exploit the general idea of solids flowing due to ion impacts in order to establish a general framework into which different mechanisms (such as viscous flow, stress, diffusion, or sputtering) can be incorporated, under generic physical conservation laws. As opposed to formulating phenomenological interfacial equations, this approach allows to assess systematically the relevance and interplay of different physical mechanisms influencing surface pattern formation by IBS.

  4. Production of Solar Cells in Space from Non Specific Ores by Utilization of Electronically Enhanced Sputtering

    Science.gov (United States)

    Curreri, Peter A.

    2009-01-01

    An ideal method of construction in space would utilize some form of the Universal Differentiator and Universal Constructor as described by Von Neumann (1). The Universal Differentiator is an idealized non ore specific extractive device which is capable of breaking any ore into its constituent elements, and the Universal Constructor can utilize these elements to build any device with controllability to the nanometer scale. During the Human Exploration Initiative program in the early 1990s a conceptual study was done (2) to understand whether such devices were feasible with near term technology for the utilization of space resources and energy. A candidate system was proposed which would utilize electronically enhanced sputtering as the differentiator. Highly ionized ions would be accelerated to a kinetic energy at which the interaction between them and the lattice elections in the ore would be at a maximum. Experiments have shown that the maximum disintegration of raw material occurs at an ion kinetic energy of about 5 MeV, regardless of the composition and structure of the raw material. Devices that could produce charged ion beams in this energy range in space were being tested in the early 1990s. At this energy, for example an ion in a beam of fluorine ions yields about 8 uranium ions from uranium fluoride, 1,400 hydrogen and oxygen atoms from ice, or 7,000 atoms from sulfur dioxide ice. The ions from the disintegrated ore would then be driven by an electrical field into a discriminator in the form of a mass spectrometer, where the magnetic field would divert the ions into collectors for future use or used directly in molecular beam construction techniques. The process would require 10-7 Torr vacuum which would be available in space or on the moon. If the process were used to make thin film silicon solar cells (ignoring any energy inefficiency for beam production), then energy break even for solar cells in space would occur after 14 days.

  5. In-situ sputtering apparatus

    Science.gov (United States)

    Erickson, Mark R.; Poole, Henry J.; Custer, III, Arthur W.; Hershcovitch, Ady

    2015-06-09

    A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

  6. A survey of techniques to reduce and manage external beam radiation-induced xerostomia in British oncology and radiotherapy departments

    Energy Technology Data Exchange (ETDEWEB)

    Macknelly, Andrew [Norfolk and Norwich University Hospital (United Kingdom); Day, Jane [Faculty of Health, Wellbeing and Science, University Campus Suffolk, Waterfront Building, Neptune Quay, Ipswich (United Kingdom)], E-mail: j.day@ucs.ac.uk

    2009-11-15

    Xerostomia is the most common side effect of external beam radiotherapy to the head and neck [Anand A, Jain J, Negi P, Chaudhoory A, Sinha S, Choudhury P, et-al. Can dose reduction to one parotid gland prevent xerostomia? - A feasibility study for locally advanced head and neck cancer patients treated with intensity-modulated radiotherapy. Clinical Oncology 2006;18(6):497-504.]. A survey was carried out in British oncology departments to determine what treatment regimes, to minimise xerostomia, are used for patients with head-and-neck cancers treated with external beam radiotherapy. A semi-structured questionnaire consisting of both quantitative and qualitative questions was designed that asked departments which of the identified methods they used, why a method might not be currently employed, and whether its use had ever been considered. The study found that there are wide disparities between the techniques employed by oncology departments to avoid and reduce xerostomia in patients with cancers of the head and neck. The National Institute of Clinical Health and Excellence, [National Institute for Clinical Health and Excellence (NICE). Improving outcomes in head and neck cancers: the manual. London: Office of Public Sector Information; 2004.] for example, recommends that patients are given dental care and dietary advice but some departments did not appear to be doing this. Less than half of departments stated that they offer complementary therapies and less than 40% prescribed pilocarpine, a saliva-stimulant. Only two respondents stated that they use amifostine, a radioprotector, during radiotherapy treatment to the head and neck. The results also suggested a move toward using Intensity Modulated Radiotherapy (IMRT) for treating head-and-neck cancers which offers better normal tissue sparing than three-dimensional conformal radiotherapy. [Anand A, Jain J, Negi P, Chaudhoory A, Sinha S, Choudhury P, et al. Can dose reduction to one parotid gland prevent xerostomia

  7. High efficiency, hybrid electrochromic device on polycarbonate substrates with neon sputtered WO3-x thin films

    OpenAIRE

    2016-01-01

    Electrochromic materials change color reversibly by applying an external DC voltage. One among the many emerging application of electro-chromics is the smart windows. The coloration efficiency, the optical colour modulation and the cyclability are the factors that bench mark the device. Tungsten oxide (WO3-x) is versatile material and reactive DC magnetron sputtering (with argon as sputter gas) technique is common for electro-chromics. In the present communication we have prepared tungsten ox...

  8. Measurements of fluorine depth-profiles on TiAl turbine blades using ion beam analytical techniques

    Energy Technology Data Exchange (ETDEWEB)

    Neve, S. [Institute for Nuclear Physics (IKF), Goethe-University, Frankfurt am Main (Germany); Masset, P.J. [Karl-Winnacker-Institute, DECHEMA e.V., Frankfurt am Main (Germany); TU Bergakademie Freiberg, Center for Innovation Competence VIRTUHCON, Freiberg (Germany); Zschau, H.E.; Schuetze, M. [Karl-Winnacker-Institute, DECHEMA e.V., Frankfurt am Main (Germany)

    2011-07-15

    Intermetallic TiAl alloys are foreseen to substitute Ni-based alloys in several high-temperature applications such as turbine blades for aeronautics. Because of their low density the mass of these components could be reduced by half. However, a mixed oxide scale of TiO{sub 2} and Al{sub 2}O{sub 3} which provides no oxidation protection is growing at temperatures above 700 C. By means of the halogen-effect the high-temperature oxidation resistance of TiAl alloys can be improved by orders of magnitude. Therefore fluorine was introduced into turbine blades using two different chemical fluorination methods. The application of a fluorine treatment promotes the growth of a pure and dense alumina scale which prevents the alloy from increased oxidation. In previous work it has been shown that an appropriate fluorine content after oxidation and its location beneath the surface are indicators of a successful fluorine effect. In the present work, the fluorine content was measured before and after oxidation of TNB alloy as a function of depth by using proton induced gamma-ray emission (PIGE) in a specially designed vacuum chamber at the 2.5 MV van-de-Graaff accelerator at the IKF. Additionally, composition and thickness of the oxide scale was determined by Rutherford backscattering spectrometry (RBS). The ion beam techniques are non-destructive and thus offer a method for quality assurance of the halogen treatment. (Copyright copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)

  9. Automated double-cone-beam CT fusion technique. Enhanced evaluation of glue distribution in cases of spinal dural arteriovenous fistula (SDAVF) embolisation

    Energy Technology Data Exchange (ETDEWEB)

    Farago, Giuseppe [Foundation Neurological Institute ' ' C. Besta' ' , Department of Interventional Neuroradiology, Milan (Italy); Fondazione IRCCS Istituto Neurologico Carlo Besta, Department of Interventional Neuroradiology, Milan (Italy); Caldiera, V. [Foundation Neurological Institute ' ' C. Besta' ' , Department of Interventional Neuroradiology, Milan (Italy); Antozzi, C.; Bellino, A. [Foundation Neurological Institute ' ' C. Besta' ' , Department of Neuroimmunology and Neuromuscular Diseases, Milan (Italy); Innocenti, A. [Foundation Neurological Institute ' ' C. Besta' ' , Department of Neuro-Oncology, Milan (Italy); Ciceri, E. [Foundation Neurological Institute ' ' C. Besta' ' , Department of Interventional Neuroradiology, Milan (Italy); Azienda Ospedaliera Universitaria Integrata Borgo Trento, Department of Neuroradiology, Verona (Italy)

    2017-05-15

    Spinal dural arteriovenous fistulas (SDAVFs) are acquired diseases that represent the majority of all arteriovenous spinal shunts, leading to progressive and disabling myelopathy. Treatment is focused on accurately disconnecting the fistula point. We present our experience with the double-cone-beam CT fusion technique successfully applied to evaluate treatment results in a series of SDAVFs. Between November 2011 and December 2015 we performed double-DynaCT acquisition (pre- and post-embolisation) in 12 cases of SDAVF. A successful DynaCT fusion technique was only achieved in the group of patients with pre- and post-treatment images acquired at the same time as the treatment session, under general anaesthesia (4/12). DynaCT performed on different days proved to be inadequate for the automated fusion technique because of changes in the body position (8/12). A pre-treatment flat-panel cone-beam CT with contrast, at the time of diagnostic angiography, can be very helpful to detect the correct level of the fistula and the relationship between the fistula and the surrounding structures. In case of the endovascular approach, additional post-treatment native acquisition merged with the pre-treatment acquisition (double-cone-beam CT fusion technique) permits to immediately evaluate the distribution of the glue cast and to confirm the success of the procedure. (orig.)

  10. Acute side effects after dose-escalation treatment of prostate cancer using the new urethral catheter BeamCath{sup R} technique

    Energy Technology Data Exchange (ETDEWEB)

    Fransson, Per; Loefroth, P.O.; Franzen, L.; Henriksson, Roger; Bergstroem, P.; Widmark, A. [Umeaa Univ. (Sweden). Dept. of Oncology

    2001-11-01

    Acute side effects after dose-escalated radiotherapy for prostate cancer with different treatment techniques were evaluated, using a daily diary recorded by the patients. Dose escalation was performed using the urethral catheter BeamCath{sup R} (registered trade mark name) technique. Side effects were evaluated in 267 patients by means of a daily diary during the treatment and at 3-months' follow-up. The patients' evaluations were compared with those of patients treated with conventional or conformal techniques. Looser stools were reported in the conventional (placebo) and 76 Gy groups at 3-months' follow-up compared with at week 1. No other obvious increase in rectal or bladder morbid