WorldWideScience

Sample records for amorphous silicon alloys

  1. Preparation of hydrogenated amorphous silicon tin alloys

    OpenAIRE

    Vergnat, M.; Marchal, G.; Piecuch, M.

    1987-01-01

    This paper describes a new method to obtain hydrogenated amorphous semiconductor alloys. The method is reactive co-evaporation. Silicon tin hydrogenated alloys are prepared under atomic hydrogen atmosphere. We discuss the influence of various parameters of preparation (hydrogen pressure, tungsten tube temperature, substrate temperature, annealing...) on electrical properties of samples.

  2. Hydrogen distribution in amorphous silicon and silicon based alloys

    International Nuclear Information System (INIS)

    The results of hydrogen evolution experiments on amorphous silicon alloys prepared by high frequency PECVD of gas mixtures containing SiH4, NH3, PH2, B2H6 are compared. Using a very low heating rate of 5 degree/min it is possible to resolve fine structure on the exodiffusion spectra. Three evolution processes are observed: (a) low temperature effusion due to included gas (b) mid temperature effusion due to 'clustered' hydrogen bonds (c) high temperature effusion due to 'isolated' hydrogen bonds In addition it is possible to oberve very fine structure 'puffing' due to the release of molecular hydrogen at mid to high temperature. Silicon and silicon nitride films have been annealed at low temperatures before the exodiffusion experiments and changes in the evolution spectra are observed, dependent on the annealing process. A scanning electron microscope study of the effect of high temperature heat treatment has also been undertaken. These results are correlated with infra-red absorption measurements and the influence of doping concentration and substrate character discussed. Under certain preparation conditions the films blister on heating and finally burst forming circular craters, and these effects are shown to be dependent on substrate material and intrinsic stress of the as-grown films

  3. Integral bypass diodes in an amorphous silicon alloy photovoltaic module

    Science.gov (United States)

    Hanak, J. J.; Flaisher, H.

    1991-01-01

    Thin-film, tandem-junction, amorphous silicon (a-Si) photovoltaic modules were constructed in which a part of the a-Si alloy cell material is used to form bypass protection diodes. This integral design circumvents the need for incorporating external, conventional diodes, thus simplifying the manufacturing process and reducing module weight.

  4. Ultralight amorphous silicon alloy photovoltaic modules for space applications

    Science.gov (United States)

    Hanak, J. J.; Chen, Englade; Fulton, C.; Myatt, A.; Woodyard, J. R.

    1987-01-01

    Ultralight and ultrathin, flexible, rollup monolithic PV modules have been developed consisting of multijunction, amorphous silicon alloys for either terrestrial or aerospace applications. The rate of progress in increasing conversion efficiency of stable multijunction and multigap PV cells indicates that arrays of these modules can be available for NASA's high power systems in the 1990's. Because of the extremely light module weight and the highly automated process of manufacture, the monolithic a-Si alloy arrays are expected to be strongly competitive with other systems for use in NASA's space station or in other large aerospace applications.

  5. Glow discharge amorphous silicon tin alloys

    Energy Technology Data Exchange (ETDEWEB)

    Mahan, A H; Sanchez, A; Williamson, D L; von Roedern, B; Madan, A

    1984-06-01

    We present basic density of states, photoresponse, and transport measurements made on low bandgap a-SiSn:H alloys produced by RF glow discharge deposition of SiH/sub 4/, H/sub 2/ and Sn(CH/sub 3/)/sub 4/. Although we demonstrate major changes in the local bonding structure and the density of states, the normalized photoresponse still remains poor. We provide evidence that two types of defect levels are produced with Sn alloying, and that the resultant density of states increase explains not only the n- to p-type conductivity transition reported earlier, but also the photoresponse behavior. We also report that a-SiSn:H can be doped with P. From our device analysis we suggest that in order to improve the alloy performance significantly, the density of states should be decreased to levels comparable to or lower than those presently obtained in a-Si:H.

  6. Silicon nanocrystals on amorphous silicon carbide alloy thin films: Control of film properties and nanocrystals growth

    International Nuclear Information System (INIS)

    The present study demonstrates the growth of silicon nanocrystals on amorphous silicon carbide alloy thin films. Amorphous silicon carbide films [a-Si1−xCx:H (with x 1−xCx:H layer. The effect of short-time annealing at 700 °C on the composition and properties of the layer was studied by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. It was observed that the silicon-to-carbon ratio in the layer remains unchanged after short-time annealing, but the reorganization of the film due to a large dehydrogenation leads to a higher density of SiC bonds. Moreover, the film remains amorphous after the performed short-time annealing. In a second part, it was shown that a high density (1 × 1012 cm−2) of silicon nanocrystals can be grown by low pressure chemical vapor deposition on a-Si0.8C0.2 surfaces at 700 °C, from silane diluted in hydrogen. The influence of growth time and silane partial pressure on nanocrystals size and density was studied. It was also found that amorphous silicon carbide surfaces enhance silicon nanocrystal nucleation with respect to SiO2, due to the differences in surface chemical properties. - Highlights: ► Silicon nanocrystals (Si-NC) growth on amorphous silicon carbide alloy thin films ► Plasma deposited amorphous silicon carbide films with well-controlled properties ► Study on the thermal effect of 700 °C short-time annealing on the layer properties ► Low pressure chemical vapor deposition (LPCVD) of Si-NC ► High density (1 × 1012 cm−2) of Si-NC was achieved on a-Si0.8C0.2 surfaces by LPCVD.

  7. Radiation Resistance Studies of Amorphous Silicon Alloy Photovoltaic Materials

    Science.gov (United States)

    Woodyard, James R.

    1994-01-01

    The radiation resistance of commercial solar cells fabricated from hydrogenated amorphous silicon alloys was investigated. A number of different device structures were irradiated with 1.0 MeV protons. The cells were insensitive to proton fluences below 1E12 sq cm. The parameters of the irradiated cells were restored with annealing at 200 C. The annealing time was dependent on proton fluence. Annealing devices for one hour restores cell parameters for fluences below lE14 sq cm require longer annealing times. A parametric fitting model was used to characterize current mechanisms observed in dark I-V measurements. The current mechanisms were explored with irradiation fluence, and voltage and light soaking times. The thermal generation current density and quality factor increased with proton fluence. Device simulation shows the degradation in cell characteristics may be explained by the reduction of the electric field in the intrinsic layer.

  8. Electonic properties of hydrogenated amorphous silicon-germanium alloys

    Energy Technology Data Exchange (ETDEWEB)

    Bullot, J.; Galin, M.; Gauthier, M. (Universite de Paris-Sud, Orsay (France)); Bourdon, B. (CIT-Alcatel Transmission, Marcoussis (France))

    1983-06-01

    The electronic properties of some binary hydrogenated amorphous silicon-germanium alloys a-Sisub(x)Gesub(1-x):H in the silicon rich region (x > 0.6) are investigated. Experimental evidence is presented of photo-induced effects similar to those described in Si:H (Staebler-Wronski effect). The electronic properties are then studied from the dual point of view of the germanium content dependence and of the photo and thermal histories of the films. The dark conductivity changes between the annealed state and the light-soaked state are interpreted in terms of the variation of the temperature coefficient of the Fermi level. The photoconductivity efficiency is shown to remain close to that of a-Si:H for 1 > x >= 0.9 and to strongly decrease when the germanium content is further increased: the photoresponse of the Sisub(0.62)Gesub(0.38) alloy is 10/sup 4/ times smaller than that of a-Si:H. This deterioration of the photoconductive properties is explained in terms of the increase of the density of gap states following Ge substitution. This conclusion is based on the study of the width of the exponential absorption edge and on the results of photoconductivity time response studies. The latter data are interpreted by means of the model of Rose of trapping and recombination kinetics and it is found that for x approximately 0.6 the density of states at 0.4-0.5 eV below the mobility edge is 7 x 10/sup 17/ eV/sup -1/ cm/sup -3/ as compared to 2.4 x 10/sup 16/ eV/sup -1/ cm/sup -3/ for x = 0.97.

  9. Silicon nanocrystals on amorphous silicon carbide alloy thin films: Control of film properties and nanocrystals growth

    Energy Technology Data Exchange (ETDEWEB)

    Barbe, Jeremy, E-mail: jeremy.barbe@hotmail.com [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Universite de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, 31062 Toulouse (France); Xie, Ling; Leifer, Klaus [Department of Engineering Sciences, Uppsala University, Box 534, S-751 21 Uppsala (Sweden); Faucherand, Pascal; Morin, Christine; Rapisarda, Dario; De Vito, Eric [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France); Makasheva, Kremena; Despax, Bernard [Universite de Toulouse, UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d' Energie), 118 route de Narbonne, 31062 Toulouse (France); CNRS, LAPLACE, F-31062 Toulouse (France); Perraud, Simon [CEA, Liten, 17 rue des Martyrs, 38054 Grenoble Cedex 9 (France)

    2012-11-01

    The present study demonstrates the growth of silicon nanocrystals on amorphous silicon carbide alloy thin films. Amorphous silicon carbide films [a-Si{sub 1-x}C{sub x}:H (with x < 0.3)] were obtained by plasma enhanced chemical vapor deposition from a mixture of silane and methane diluted in hydrogen. The effect of varying the precursor gas-flow ratio on the film properties was investigated. In particular, a wide optical band gap (2.3 eV) was reached by using a high methane-to-silane flow ratio during the deposition of the a-Si{sub 1-x}C{sub x}:H layer. The effect of short-time annealing at 700 Degree-Sign C on the composition and properties of the layer was studied by X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. It was observed that the silicon-to-carbon ratio in the layer remains unchanged after short-time annealing, but the reorganization of the film due to a large dehydrogenation leads to a higher density of SiC bonds. Moreover, the film remains amorphous after the performed short-time annealing. In a second part, it was shown that a high density (1 Multiplication-Sign 10{sup 12} cm{sup -2}) of silicon nanocrystals can be grown by low pressure chemical vapor deposition on a-Si{sub 0.8}C{sub 0.2} surfaces at 700 Degree-Sign C, from silane diluted in hydrogen. The influence of growth time and silane partial pressure on nanocrystals size and density was studied. It was also found that amorphous silicon carbide surfaces enhance silicon nanocrystal nucleation with respect to SiO{sub 2}, due to the differences in surface chemical properties. - Highlights: Black-Right-Pointing-Pointer Silicon nanocrystals (Si-NC) growth on amorphous silicon carbide alloy thin films Black-Right-Pointing-Pointer Plasma deposited amorphous silicon carbide films with well-controlled properties Black-Right-Pointing-Pointer Study on the thermal effect of 700 Degree-Sign C short-time annealing on the layer properties Black-Right-Pointing-Pointer Low pressure

  10. Deployable aerospace PV array based on amorphous silicon alloys

    Science.gov (United States)

    Hanak, Joseph J.; Walter, Lee; Dobias, David; Flaisher, Harvey

    1989-01-01

    The development of the first commercial, ultralight, flexible, deployable, PV array for aerospace applications is discussed. It is based on thin-film, amorphous silicon alloy, multijunction, solar cells deposited on a thin metal or polymer by a proprietary, roll-to-roll process. The array generates over 200 W at AM0 and is made of 20 giant cells, each 54 cm x 29 cm (1566 sq cm in area). Each cell is protected with bypass diodes. Fully encapsulated array blanket and the deployment mechanism weigh about 800 and 500 g, respectively. These data yield power per area ratio of over 60 W/sq m specific power of over 250 W/kg (4 kg/kW) for the blanket and 154 W/kg (6.5 kg/kW) for the power system. When stowed, the array is rolled up to a diameter of 7 cm and a length of 1.11 m. It is deployed quickly to its full area of 2.92 m x 1.11 m, for instant power. Potential applications include power for lightweight space vehicles, high altitude balloons, remotely piloted and tethered vehicles. These developments signal the dawning of a new age of lightweight, deployable, low-cost space arrays in the range from tens to tens of thousands of watts for near-term applications and the feasibility of multi-100 kW to MW arrays for future needs.

  11. Production Of Tandem Amorphous Silicon Alloy Solar Cells In A Continuous Roll-To-Roll Process

    Science.gov (United States)

    Izu, Masat; Ovshinsky, Stanford R.

    1983-09-01

    A roll-to-roll plasma deposition machine for depositing multi-layered amorphous alloys has been developed. The plasma deposition machine (approximately 35 ft. long) has multiple deposition areas and processes 16-inch wide stainless steel substrate continuously. Amorphous photovoltaic thin films (less than 1pm) having a six layered structure (PINPIN) are deposited on a roll of 16-inch wide 1000 ft. long stainless steel substrate, continu-ously, in a single pass. Mass production of low-cost tandem amorphous solar cells utilizing roll-to-roll processes is now possible. A commercial plant utilizing this plasma deposition machine for manufacturing tandem amorphous silicon alloy solar cells is now in operation. At Energy Conversion Devices, Inc. (ECD), one of the major tasks of the photovoltaic group has been the scale-up of the plasma deposition process for the production of amorphous silicon alloy solar cells. Our object has been to develop the most cost effective way of producing amorphous silicon alloy solar cells having the highest efficiency. The amorphous silicon alloy solar cell which we produce has the following layer structure: 1. Thin steel substrate. 2. Multi-layered photovoltaic amorphous silicon alloy layers (approximately 1pm thick; tandem cells have six layers). 3. ITO. 4. Grid pattern. 5. Encapsulant. The deposition of the amorphous layer is technologically the key process. It was clear to us from the beginning of this scale-up program that amorphous silicon alloy solar cells produced in wide width, continuous roll-to-roll production process would be ultimate lowest cost solar cells according to the following reasons. First of all, the material cost of our solar cells is low because: (1) the total thickness of active material is less than 1pm, and the material usage is very small; (2) silicon, fluorine, hydrogen, and other materials used in the device are abundant and low cost; (3) thin, low-cost substrate is used; and (4) product yield is high. In

  12. Amorphous silicon thermometer

    International Nuclear Information System (INIS)

    The carbon glass resistance thermometers (CGRT) shows an unstable drift by heat cycles. Since we were looking for a more stable element of thermometer for cryogenic and high magnetic field environments, we selected amorphous silicon as a substitute for CGRT. The resistance of many amorphous samples were measured at 4K, at 77K, and 300K. We eventually found an amorphous silicon (Si-H) alloy whose the sensitivity below 77K was comparable to that of the germanium resistance thermometer with little magnetic field influence. (author)

  13. Properties and local structure of plasma-deposited amorphous silicon-carbon alloys

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon-carbon alloy films were plasma-deposited from methane and silane, varying gas ratio, R.F. power and substrate temperature. Carbon addition increases the optical gap, but also raises the dangling bond density while decreasing conductivity. Low C alloys can be gas-phase doped both p and n type. In the IR spectra the various Si-C stretching modes observed between 650 and 780 cm/sup -1/ are explained by back bonding variations. A tentative method of assigning this shift to back bonding of C to the Si is given. A distribution of modes is observed for all alloys, with each mode appearing even at 2% C. The distribution is sensitive to substrate temperature, but is stable after vacuum annealing to 4000C

  14. Intensity dependence of the minority-carrier difusion length in amorphous silicon based alloys

    Science.gov (United States)

    Hack, M.; Shur, M.

    1984-04-01

    Many of the recent measurements of the minority-carrier diffusion length (Lp) in amorphous silicon based alloys have been based on a utilization of the surface photovoltage (SPV). In this case an equation relating photon flux and Lp under ideal conditions has to be modified because of the back diffusion of carriers and the effects of high field regions. To account for the high field region, the 'aparent' diffusion length has been determined for varying intensities of bias light. In the present investigation, a theoretical analysis shows that the zero field diffusion length is indeed intensity dependent and that this dependence can be directly related to the slope of the density of states near the valence band edge. The intensity dependence of the minority carrier diffusion length and the energy slope of the density of states near the valence band edge are obtained on the basis of experimental results.

  15. Structure of amorphous silicon alloy films: Annual subcontract report, January 15, 1988--January 14, 1989

    Energy Technology Data Exchange (ETDEWEB)

    Norberg, R.E.; Fedders, P.A.

    1989-06-01

    The principal objective of this research program has been to improve the understanding at the microscopic level of amorphous silicon-germanium-alloy films deposited under various conditions to assist researchers to produce higher quality films. The method has been a joint theoretical and experimental approach to the correlation of NMR, ESR, and other characterizations, especially relating to rearrangements of hydrogen. Deuteron magnetic resonance reveals the presence of (and changes in) tightly bonded hydrogen (deuterium), weakly bonded hydrogen, molecular hydrogen, and rotating silyl groups. Microvoids are investigated via observation of para D/sub 2/ for which /Delta/M/sub J/ transitions are frozen out. Solid echoes reveal HD and ortho D/sub 2/ trapped as singles in the semiconductor matrix. Theoretical calculations show dangling bonds to be more likely than floating bonds. 23 refs., 11 figs.

  16. Highly ordered amorphous silicon-carbon alloys obtained by RF PECVD

    CERN Document Server

    Pereyra, I; Carreno, M N P; Prado, R J; Fantini, M C A

    2000-01-01

    We have shown that close to stoichiometry RF PECVD amorphous silicon carbon alloys deposited under silane starving plasma conditions exhibit a tendency towards c-Si C chemical order. Motivated by this trend, we further explore the effect of increasing RF power and H sub 2 dilution of the gaseous mixtures, aiming to obtain the amorphous counterpart of c-Si C by the RF-PECVD technique. Doping experiments were also performed on ordered material using phosphorus and nitrogen as donor impurities and boron and aluminum as acceptor ones. For nitrogen a doping efficiency close to device quality a-Si:H was obtained, the lower activation energy being 0,12 eV with room temperature dark conductivity of 2.10 sup - sup 3 (OMEGA.cm). Nitrogen doping efficiency was higher than phosphorous for all studied samples. For p-type doping, results indicate that, even though the attained conductivity values are not device levels, aluminum doping conducted to a promising shift in the Fermi level. Also, aluminum resulted a more efficie...

  17. Microstructures of the silicon carbide nanowires obtained by annealing the mechanically-alloyed amorphous powders

    International Nuclear Information System (INIS)

    Silicon, graphite and boron nitride powders were mechanically alloyed for 40 h in argon. The as-milled powders were annealed at 1700 °C in nitrogen for 30 min. The annealed powders are covered by a thick layer of gray–green SiC nanowires, which are 300 nm to 1000 nm in diameter and several hundred microns in length. Trace iron in the raw powders acts as a catalyst, promoting the V–L–S process. It follows that the actual substances contributing to the growth of the SiC nanowires may be silicon, graphite and the metal impurities in the raw powders. The results from HRTEM and XRD reveal that the products contain both straight α/β-SiC nanowires and nodular α/β-SiC nanochains. It is interestingly found that 6H–SiC coexists with 3C–SiC in one nodular nanowire. This novel structure may introduce periodic potential field along the longitudinal direction of the nanowires, and may find applications in the highly integrated optoelectronic devices. - Graphical abstract: Display Omitted - Highlights: • SiC nanowires were prepared by annealing the mechanically alloyed amorphous powders. • SiC nanowires are 300 nm to 1000 nm in diameter and several hundred microns in length. • The products contain both straight α/β-SiC nanowires and nodular α/β-SiC nanochains. • Trace Fe in the raw powders acts as a catalyst, promoting the V–L–S process. • 6H–SiC coexists with 3C–SiC in one nodular SiC nanowire

  18. Microstructures of the silicon carbide nanowires obtained by annealing the mechanically-alloyed amorphous powders

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Pengfei, E-mail: zhangpengfei1984@163.com; Li, Xinli

    2015-07-15

    Silicon, graphite and boron nitride powders were mechanically alloyed for 40 h in argon. The as-milled powders were annealed at 1700 °C in nitrogen for 30 min. The annealed powders are covered by a thick layer of gray–green SiC nanowires, which are 300 nm to 1000 nm in diameter and several hundred microns in length. Trace iron in the raw powders acts as a catalyst, promoting the V–L–S process. It follows that the actual substances contributing to the growth of the SiC nanowires may be silicon, graphite and the metal impurities in the raw powders. The results from HRTEM and XRD reveal that the products contain both straight α/β-SiC nanowires and nodular α/β-SiC nanochains. It is interestingly found that 6H–SiC coexists with 3C–SiC in one nodular nanowire. This novel structure may introduce periodic potential field along the longitudinal direction of the nanowires, and may find applications in the highly integrated optoelectronic devices. - Graphical abstract: Display Omitted - Highlights: • SiC nanowires were prepared by annealing the mechanically alloyed amorphous powders. • SiC nanowires are 300 nm to 1000 nm in diameter and several hundred microns in length. • The products contain both straight α/β-SiC nanowires and nodular α/β-SiC nanochains. • Trace Fe in the raw powders acts as a catalyst, promoting the V–L–S process. • 6H–SiC coexists with 3C–SiC in one nodular SiC nanowire.

  19. Corrosion resistant amorphous alloys

    International Nuclear Information System (INIS)

    A review of publication data on corrosion resistance of amorphous alloys and the methods of amorphization of surface layers of massive materials (laser treatment, iron implantation, detonation-gas spraying, cathode and ion sputtering, electrodeposition) was made. A study was made on corrosion properties of Fe66Cr11B10Si4 alloy in cast state and after laser irradiation, rendering the surface amorphous as well as the samples of Arenco iron and steel 20 with ion-plasma coatings of Fe-Cr-Ni-Ti alloy. It was established that amorphous coatings posses much higher corrosion resistance as compared to crystalline alloys on the same base

  20. Comparative anomalous small-angle X-ray scattering study of hotwire and plasma grown amorphous silicon-germanium alloys

    OpenAIRE

    Goerigk, G.; Williamson, D. L.

    2001-01-01

    The nanostructure of hydrogenated amorphous silicon-germanium alloys, a-Si1-xGex:H, prepared by the hotwire deposition technique (x=0.06-0.79) and by the plasma enhanced chemical vapor deposition technique (x=0 and 0.50) was analyzed by anomalous small-angle x-ray scattering experiments. For all alloys with x >0 the Ge component was found to be inhomogeneously distributed with correlation lengths of about 1 nm. A systematic increase of the separated scattering was found due to the increasing ...

  1. Atomically resolved surface structures of vapor deposited amorphous silicon-carbon alloys: An atomic force microscopy and spectroscopic study

    International Nuclear Information System (INIS)

    Silicon carbide alloys are widely used in high-tech applications due to their interesting combination of chemical, mechanical and electronic properties. Growing thin films of this material in a simple and controlled way is a hot topic in modern material's science. In particular, the possibility to tailor the film properties just by tuning the deposition temperature would be an important progress. In the present work amorphous silicon-carbon alloys thin films have been deposited by electron beam sublimation of a poly-crystalline silicon carbide target in vacuum environment. The deposition temperature was varied from Room Temperature to about 1300 K. The resulting films were analyzed by means of Ultra High Vacuum-Atomic Force Microscopy (UHV-AFM) down to even atomic resolution. The observed features agree with literature data, e.g. interatomic bond lengths, as achieved by others methods, and the structural arrangements of silicon and carbon atoms as concluded from IR and Raman spectroscopy measurements carried out on the same samples. The results not only allow a correlation between film properties and deposition temperature but also support the notion of the UHV-AFM images of the amorphous surfaces being atomically resolved.

  2. Investigation of Sb diffusion in amorphous silicon

    OpenAIRE

    Csik, A.; Langer, G A; Erdelyi, G.; Beke, D. L.; Erdelyi, Z.; Vad, K.

    2009-01-01

    Amorphous silicon materials and its alloys become extensively used in some technical applications involving large area of the microelectronic and optoelectronic devices. However, the amorphous-crystalline transition, segregation and diffusion processes still have numerous unanswered questions. In this work we study the Sb diffusion into an amorphous Si film by means of Secondary Neutral Mass Spectrometry (SNMS). Amorphous Si/Si1-xSbx/Si tri-layer samples with 5 at% antimony concentration were...

  3. Development of radiation detectors based on hydrogenated amorphous silicon and its alloys

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon and related materials have been applied to radiation detectors, utilizing their good radiation resistance and the feasibility of making deposits over a large area at low cost. Effects of deposition parameters on various material properties of a-Si:H have been studied to produce a material satisfying the requirements for specific detection application. Thick(-∼50 μm), device quality a-Si:H p-i-n diodes for direct detection of minimum ionizing particles have been prepared with low internal stress by a combination of low temperature growth, He-dilution of silane, and post annealing. The structure of the new film contained voids and tiny crystalline inclusions and was different from the one observed in conventional a-Si:H. Deposition on patterned substrates was attempted as an alternative to controlling deposition parameters to minimize substrate bending and delamination of thick a-Si:H films. Growth on an inversed-pyramid pattern reduced the substrate bending by a factor of 3∼4 for the same thickness film. Thin (0.1 ∼ 0.2 μm) films of a-Si:H and a-SiC:H have been applied to microstrip gas chambers to control gain instabilities due to charges on the substrate. Light sensitivity of the a-Si:H sheet resistance was minimized and the surface resistivity was successfully' controlled in the range of 1012 ∼ 1017 Ω/□ by carbon alloying and boron doping. Performance of the detectors with boron-doped a-Si:C:H layers was comparable to that of electronic-conducting glass. Hydrogen dilution of silane has been explored to improve electrical transport properties of a-Si:H material for high speed photo-detectors and TFT applications

  4. An overview of uncooled infrared sensors technology based on amorphous silicon and silicon germanium alloys

    Energy Technology Data Exchange (ETDEWEB)

    Ambrosio, Roberto; Mireles, Jose Jr. [Technology and Engineering Institute, Ciudad Juarez University UACJ, Av. Del Charro 450N, 32310 Chihuahua (Mexico); Moreno, Mario; Torres, Alfonso; Kosarev, Andrey [National Institute for Astrophysics Optics and Electronics INAOE, Luis E. Erro 1, PO Box 51 and 216, 7200 Puebla (Mexico); Heredia, Aurelio [Universidad Popular Autonoma del Estado de Puebla, 21 sur 1103 Col. Santiago, 72160 Puebla (Mexico)

    2010-04-15

    At the present time there are commercially available large un-cooled micro-bolometer arrays (as large as 1024 x 768 pixels) for a variety of thermal imaging applications. Different thermo-sensing materials have been employed as thermo sensing elements as Vanadium Oxide (VO{sub x}), metals, and amorphous and polycrystalline semiconductors. Those materials present good characteristics but also have some disadvantages. As a consequence none of the commercially available arrays contain optimum pixels with an optimum thermo-sensing material. This paper reviews the development of the un-cooled bolometer technology and the research achievements on this area, with special attention on the key factors that would lead to improve the pixels performance characteristics. The work considers the R and D of microbolometer arrays and the integration with MEMS and IC technologies. A comparative study with the state of the art and data reported in literature is presented. Finally, further directions of uncooled bolometer based in thin films materials are also discussed in this paper. (copyright 2010 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  5. Amorphous silicon based particle detectors

    OpenAIRE

    Wyrsch, N; Franco, A; Riesen, Y.; Despeisse, M; S. Dunand; Powolny, F; Jarron, P.; Ballif, C.

    2012-01-01

    Radiation hard monolithic particle sensors can be fabricated by a vertical integration of amorphous silicon particle sensors on top of CMOS readout chip. Two types of such particle sensors are presented here using either thick diodes or microchannel plates. The first type based on amorphous silicon diodes exhibits high spatial resolution due to the short lateral carrier collection. Combination of an amorphous silicon thick diode with microstrip detector geometries permits to achieve micromete...

  6. DEFECTS IN AMORPHOUS CHALCOGENIDES AND SILICON

    OpenAIRE

    Adler, D.

    1981-01-01

    Our comprehension of the physical properties of amorphous semiconductors has improved considerably over the past few years, but many puzzles remain. From our present perspective, the major features of chalcogenide glasses appear to be well understood, and some of the fine points which have arisen recently have been explained within the same general model. On the other hand, there are a grear number of unresolved mysteries with regard to amorphous silicon-based alloys. In this paper, the valen...

  7. Material research on amorphous silicon based alloys: Application to low-cost efficient solar cells

    International Nuclear Information System (INIS)

    Amorphous silicon solar cell technology has reached a high level of maturity, which is the result of several years of basic research and of an unprecedented industrial effort. It already occupies an unchallenged position for micro-power and indoor applications like light-powered calculators, watches, etc. With the presently available material, the technological improvements have practically reached their limits and little can be gained on the open voltage or the fill factor. The only substantial improvement to be expected is an increase in the short-circuit current by a better matching of the optical gap to the solar spectrum. In principle, one could almost double the short-circuit current by a moderate decrease of the optical gap from 1.8 eV to 1.4 eV. Unfortunately, the proper small-gap material, having good photovoltaic properties, still remains to be found and this is the subject of material research activities in many laboratories in the world. 17 refs, 4 figs

  8. Simulation in Amorphous Silicon and Amorphous Silicon Carbide Pin Diodes

    OpenAIRE

    Gonçalves, Dora; Fernandes, Miguel; Louro, Paula; Fantoni, Alessandro; Vieira, Manuela

    2014-01-01

    Part 21: Electronics: Devices International audience Photodiodes are devices used as image sensors, reactive to polychromatic light and subsequently color detecting, and they are also used in optical communication applications. To improve these devices performance it is essential to study and control their characteristics, in fact their capacitance and spectral and transient responses. This study considers two types of diodes, an amorphous silicon pin and an amorphous silicon carbide pi...

  9. Plasma Deposition of Amorphous Silicon

    Science.gov (United States)

    Calcote, H. F.

    1982-01-01

    Strongly adhering films of silicon are deposited directly on such materials as Pyrex and Vycor (or equivalent materials) and aluminum by a non-equilibrium plasma jet. Amorphous silicon films are formed by decomposition of silicon tetrachloride or trichlorosilane in the plasma. Plasma-jet technique can also be used to deposit an adherent silicon film on aluminum from silane and to dope such films with phosphorus. Ability to deposit silicon films on such readily available, inexpensive substrates could eventually lead to lower cost photovoltaic cells.

  10. Amorphous yttrium-iron alloys

    International Nuclear Information System (INIS)

    The magnetic properties of amorphous yttrium-iron alloys Ysub(1-x)Fesub(x) have been studied over a wide concentration range 0.32 2Fe17 alloys, lead in the amorphous state to spin-glass behaviour and asperomagnetic order. The dominant positive interactions produce short-range ferromagnetic correlations which persist up to room temperature. However magnetic saturation cannot be achieved for any of the alloys in applied fields of up to 180 kOe, indicating that strong negative interactions are also present. Exchange interactions become increasingly positive with increasing x, and the magnetic properties of iron-rich alloys approach those of a normal ferromagnet. (author)

  11. Characterisation of amorphous silicon alloys by RBS/ERD with self consistent data analysis using simulated annealing

    International Nuclear Information System (INIS)

    Full text: Hydrogenated amorphous silicon films are deposited by CVD onto insulating (silica) substrates for the fabrication of solar cells. 1.5MeV 4He ERD/RBS is applied to the films, and a self consistent depth profile of Si and H using the simulated annealing (SA) algorithm was obtained for each sample. The analytical procedure is described in detail, and the confidence limits of the profiles are obtained using the Markov Chain Monte Carlo method which is a natural extension of the SA algorithm. We show how the results are of great benefit to the growers

  12. An investigation of optimal interfacial film condition for Cu-Mn alloy based source/drain electrodes in hydrogenated amorphous silicon thin film transistors

    Directory of Open Access Journals (Sweden)

    Haruhiko Asanuma

    2012-06-01

    Full Text Available To aid in developing next generation Cu-Mn alloy based source/drain interconnects for thin film transistor liquid crystal displays (TFT-LCDs, we have investigated the optimal structure of a pre-formed oxide layer on phosphorus doped hydrogenated amorphous silicon (n+a-Si:H that does not degrade TFT electrical properties. We use transmission electron microscopy (TEM and electron energy loss spectroscopy (EELS to examine composition depth profiles of and structural information for the Cu-Mn alloy/n+a-Si:H interface region. In aiming to achieve the same electrical properties as those of TFTs having conventional Mo source/drain electrodes, we have obtained three important findings: (1 in typical TFT-LCD manufacturing processes, no Mn complex oxide layer is formed because Mn cannot diffuse substantially into an n+a-Si:H surface during low temperature (below 300°C processes and the growth of Mn complex oxide layer would also be limited by the absence of excess oxygen species; (2 a pre-formed silicon oxide layer much thicker than 1 nm severely degrades TFT electrical properties and therefore an ultrathin (≈1 nm silicon oxide layer is required to prevent the degradation; (3 Cu diffuses into an n+a-Si:H layer at oxygen-deficient spots and thus uniform surface oxidation is required to prevent the diffusion.

  13. Amorphous silicon crystalline silicon heterojunction solar cells

    CERN Document Server

    Fahrner, Wolfgang Rainer

    2013-01-01

    Amorphous Silicon/Crystalline Silicon Solar Cells deals with some typical properties of heterojunction solar cells, such as their history, the properties and the challenges of the cells, some important measurement tools, some simulation programs and a brief survey of the state of the art, aiming to provide an initial framework in this field and serve as a ready reference for all those interested in the subject. This book helps to ""fill in the blanks"" on heterojunction solar cells. Readers will receive a comprehensive overview of the principles, structures, processing techniques and the curre

  14. Exoelectron analysis of amorphous silicon

    Science.gov (United States)

    Dekhtyar, Yu. D.; Vinyarskaya, Yu. A.

    1994-04-01

    The method based on registration of photothermostimulated exoelectron emission (PTSE) is used in the proposed new field of investigating the structural defects in amorphous silicon (a-Si). This method can be achieved if the sample under investigation is simultaneously heated and illuminated by ultraviolet light. The mechanism of PTSE from a-Si has been studied in the case of a hydrogenized amorphous silicon (a-Si:H) film grown by glow discharge method. The electronic properties and annealing of defects were analyzed in the study. It has been shown from the results that the PTSE from a-Si:H takes place as a prethreshold single-photon external photoeffect. The exoemission spectroscopy of a-Si:H was shown to be capable in the study of thermally and optically stimulated changes in the electronic structure of defects, their annealing, as well as diffusion of atomic particles, such as hydrogen.

  15. Colloidal Photoluminescent Amorphous Porous Silicon, Methods Of Making Colloidal Photoluminescent Amorphous Porous Silicon, And Methods Of Using Colloidal Photoluminescent Amorphous Porous Silicon

    KAUST Repository

    Chaieb, Sahraoui

    2015-04-09

    Embodiments of the present disclosure provide for a colloidal photoluminescent amorphous porous silicon particle suspension, methods of making a colloidal photoluminescent amorphous porous silicon particle suspension, methods of using a colloidal photoluminescent amorphous porous silicon particle suspension, and the like.

  16. Amorphous silicon based betavoltaic devices

    OpenAIRE

    Wyrsch, N; Riesen, Y.; Franco, A; S. Dunand; Kind, H.; Schneider, S.; Ballif, C.

    2013-01-01

    Hydrogenated amorphous silicon betavoltaic devices are studied both by simulation and experimentally. Devices exhibiting a power density of 0.1 μW/cm2 upon Tritium exposure were fabricated. However, a significant degradation of the performance is taking place, especially during the first hours of the exposure. The degradation behavior differs from sample to sample as well as from published results in the literature. Comparisons with degradation from beta particles suggest an effect of tritium...

  17. Amorphous-silicon cell reliability testing

    Science.gov (United States)

    Lathrop, J. W.

    1985-01-01

    The work on reliability testing of solar cells is discussed. Results are given on initial temperature and humidity tests of amorphous silicon devices. Calibration and measurement procedures for amorphous and crystalline cells are given. Temperature stress levels are diagrammed.

  18. Investigation of the Stability and 1.0 MeV Proton Radiation Resistance of Commercially Produced Hydrogenated Amorphous Silicon Alloy Solar Cells

    Science.gov (United States)

    Lord, Kenneth R., II; Walters, Michael R.; Woodyard, James R.

    1994-01-01

    The radiation resistance of commercial solar cells fabricated from hydrogenated amorphous silicon alloys is reported. A number of different device structures were irradiated with 1.0 MeV protons. The cells were insensitive to proton fluences below 1E12 sq cm. The parameters of the irradiated cells were restored with annealing at 200 C. The annealing time was dependent on proton fluence. Annealing devices for one hour restores cell parameters for fluences below 1E14 sq cm fluences above 1E14 sq cm require longer annealing times. A parametric fitting model was used to characterize current mechanisms observed In dark I-V measurements. The current mechanism were explored with irradiation fluence, and voltage and light soaking times. The thermal generation current density and quality factor increased with proton fluence. Device simulation shows the degradation in cell characteristics may be explained by the reduction of the electric field in the intrinsic layer.

  19. Amorphous silicon based solar cells

    OpenAIRE

    Al Tarabsheh, Anas

    2007-01-01

    This thesis focuses on the deposition of hydrogenated amorphous silicon (a-Si:H) films bymeans of plasma enhanced chemical vapour deposition (PECVD). This technique allows the growth of device quality a-Si:H at relatively low deposition temperatures, below 140 °C and, therefore, enables the use of low-cost substrates, e.g. plastic foils. The maximum efficiencies of a-Si:H solar cells in this work are η= 6.8 % at a deposition temperature Tdep = 180 °C and η = 4.9 % at a deposition ...

  20. Amorphous silicon based radiation detectors

    International Nuclear Information System (INIS)

    We describe the characteristics of thin(1 μm) and thick (>30μm) hydrogenated amorphous silicon p-i-n diodes which are optimized for detecting and recording the spatial distribution of charged particles, x-rays and γ rays. For x-ray, γ ray, and charged particle detection we can use thin p-i-n photosensitive diode arrays coupled to evaporated layers of suitable scintillators. For direct detection of charged particles with high resistance to radiation damage, we use the thick p-i-n diode arrays. 13 refs., 7 figs

  1. Iron - based bulk amorphous alloys

    Directory of Open Access Journals (Sweden)

    R. Babilas

    2010-07-01

    Full Text Available Purpose: The paper presents a structure characterization, thermal and soft magnetic properties analysis of Fe-based bulk amorphous materials in as-cast state and after crystallization process. In addition, the paper gives some brief review about achieving, formation and structure of bulk metallic glasses as a special group of amorphous materials.Design/methodology/approach: The studies were performed on Fe72B20Si4Nb4 metallic glass in form of ribbons and rods. The amorphous structure of tested samples was examined by X-ray diffraction (XRD, transmission electron microscopy (TEM and scanning electron microscopy (SEM methods. The thermal properties of the glassy samples were measured using differential thermal analysis (DTA and differential scanning calorimetry (DSC. The magnetic properties contained initial and maximum magnetic permeability, coercive force and magnetic after-effects measurements were determined by the Maxwell-Wien bridge and VSM methods.Findings: The X-ray diffraction and transmission electron microscopy investigations revealed that the studied as-cast bulk metallic glasses in form of ribbons and rods were amorphous. Two stage crystallization process was observed for studied bulk amorphous alloy. The differences of crystallization temperature between ribbons and rods with chosen thickness are probably caused by different amorphous structures as a result of the different cooling rates in casting process. The SEM images showed that studied fractures could be classified as mixed fractures with indicated two zones contained “river” and “smooth” areas. The changing of chosen soft magnetic properties (μr, Bs, Hc obtained for samples with different thickness is a result of the non-homogenous amorphous structure of tested metallic glasses. The annealing process in temperature range from 373 to 773 K causes structural relaxation of tested amorphous materials, which leads to changes in their physical properties. The qualitative

  2. Tests Of Amorphous-Silicon Photovoltaic Modules

    Science.gov (United States)

    Ross, Ronald G., Jr.

    1988-01-01

    Progress in identification of strengths and weaknesses of amorphous-silicon technology detailed. Report describes achievements in testing reliability of solar-power modules made of amorphous-silicon photovoltaic cells. Based on investigation of modules made by U.S. manufacturers. Modules subjected to field tests, to accelerated-aging tests in laboratory, and to standard sequence of qualification tests developed for modules of crystalline-silicon cells.

  3. Growth and Characterization of Hydrogenated Amorphous Silicon and Hydrogenated Amorphous Silicon Carbide with Liquid Organometallic Sources.

    Science.gov (United States)

    Gaughan, Kevin David

    The growth and characterization of hydrogenated amorphous silicon (a-Si:H) and hydrogenated amorphous silicon -carbon (rm a-rm Si _{1-X}C_{X}: H) alloys employing liquid organometallic sources are described. N -type a-Si:H films were grown using a mixture of silane and tertiarybutylphosphine (TBP-rm C_4H _9P_2) vapor in a plasma enhanced chemical vapor deposition system. Impurity levels from parts per million to about 5 at. % phosphorus have been incorporated into the film with this method. Tertiarybutylphosphine is less toxic and less pyrophoric than phosphine which is usually used in n-type doping of a-Si:H films. Optical and electronic properties were characterized by room temperature as well as temperature dependent dark conductivity, photothermal deflection spectroscopy, infrared vibrational spectroscopy, electron spin resonance, and electron microprobe analysis. The gross doping properties of a-Si:H doped with TBP are the same as those obtained with phosphine. The experimental results are compared with the predictions of several models that describe the chemical equilibrium between active dopants and deep defects. A pronounced decrease in the effects of doping, such as an increase in the activation energy of electrical conductivity and an decrease in the conductivity of the sample, were seen in heavily doped films (TBP/SiH _4> 0.5%), perhaps influenced by the increased carbon and/or phosphorus concentrations. Amorphous silicon-carbide alloys have been grown by the plasma decomposition of ditertiarybutylsilane ( rm DTBS-rm SiH_2(C _4H_9)_2). The optical bandgaps, which varied from 2.2 to 3.3 eV, are strongly dependent upon the deposition conditions. The carbon concentrations in these films varied from 60 to 95 at. %. The optical band-edge is very broad compared to that which is found in a-Si:H and this breadth is essentially independent of the deposition conditions. The plasma decomposition of admixtures of DTBS and silane has produced rm a- rm Si_{1-X

  4. CVD of refractory amorphous metal alloys

    International Nuclear Information System (INIS)

    In this work, a novel process is described for the fabrication of multi-metallic amorphous metal alloy coatings using a chemical vapor deposition (CVD) technique. Of special interest in this work are amorphous metal alloys containing Mo and/or Cr which have high crystallization temperatures and readily available low decomposition temperature metal-bearing precursors. The conditions for amorphous alloy formation via CVD are described as well as the chemical properties of these materials. High temperature, aqueous corrosion tests have shown these materials (especially those containing Cr) are among the most corrosion resistant metal alloys known

  5. Bulk amorphous Mg-based alloys

    DEFF Research Database (Denmark)

    Pryds, Nini

    The present paper describes the preparation and properties of bulk amorphous quarternary Mg-based alloys and the influence of additional elements on the ability of the alloy to form bulk amorphous. The main goal is to find a Mg-based alloy system which shows both high strength to weight ratio and a...... low glass transition temperature. The alloys were prepared by using a relatively simple technique, i.e. rapid cooling of the melt in a copper wedge mould. The essential structural changes that are achieved by going from the amorphous to the crystalline state through the supercooled liquid state are...... discussed in this paper. On the basis of these measurements phase diagrams of the different systems were constructed. Finally, it is demonstrated that when pressing the bulk amorphous alloy onto a metallic dies at temperatures within the supercooled liquid region, the alloy faithfully replicates the surface...

  6. Raman Amplifier Based on Amorphous Silicon Nanoparticles

    OpenAIRE

    M.A. Ferrara; Rendina, I.; S. N. Basu; Dal Negro, L.; Sirleto, L.

    2012-01-01

    The observation of stimulated Raman scattering in amorphous silicon nanoparticles embedded in Si-rich nitride/silicon superlattice structures (SRN/Si-SLs) is reported. Using a 1427 nm continuous-wavelength pump laser, an amplification of Stokes signal up to 0.9 dB/cm at 1540.6 nm and a significant reduction in threshold power of about 40% with respect to silicon are experimentally demonstrated. Our results indicate that amorphous silicon nanoparticles are a great promise for Si-based Raman la...

  7. Laser annealing of hydrogen implanted amorphous silicon

    International Nuclear Information System (INIS)

    Amorphous silicon, prepared by silicon bombardment at energies of 200 to 250 keV, was implanted with 40 keV H2+ to peak concentrations up to 15 at .% and recrystallized in air by single 20 nsec pulses at 1.06 μm from a Nd:glass laser. Amorphous layer formation and recrystallization were verified using Raman spectroscopy and ion backscattering/channeling analysis

  8. Electron tunnelling into amorphous germanium and silicon.

    Science.gov (United States)

    Smith, C. W.; Clark, A. H.

    1972-01-01

    Measurements of tunnel conductance versus bias, capacitance versus bias, and internal photoemission were made in the systems aluminum-oxide-amorphous germanium and aluminium-oxide-amorphous silicon. A function was extracted which expresses the deviation of these systems from the aluminium-oxide-aluminium system.

  9. Challenges in amorphous silicon solar cell technology

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon is nowadays extensively used for a range of devices, amongst others solar cells. Solar cell technology has matured over the last two decades and resulted in conversion efficiencies in excess of 15%. In this paper the operation of amorphous silicon solar cells is briefly described. For tandem solar cell, amorphous silicon germanium is often used as material for the intrinsic layer of the bottom cell. This improves the red response of the cell. In order to optimize the performance of amorphous silicon germanium solar cells, profiling of the germanium concentration near the interfaces is applied. We show in this paper that the performance is strongly dependent on the width of the grading near the interfaces. The best performance is achieved when using a grading width that is as small as possible near the p-i interface and as wide as possible near the i-n interface. High-rate deposition of amorphous silicon is nowadays one of the main issues. Using the Expanding Thermal Plasma deposition method very high deposition rates can be achieved. This method has been applied for the fabrication of an amorphous silicon solar cell with a conversion efficiency of 5,8%. (authors)

  10. Atomic-scale disproportionation in amorphous silicon monoxide.

    Science.gov (United States)

    Hirata, Akihiko; Kohara, Shinji; Asada, Toshihiro; Arao, Masazumi; Yogi, Chihiro; Imai, Hideto; Tan, Yongwen; Fujita, Takeshi; Chen, Mingwei

    2016-01-01

    Solid silicon monoxide is an amorphous material which has been commercialized for many functional applications. However, the amorphous structure of silicon monoxide is a long-standing question because of the uncommon valence state of silicon in the oxide. It has been deduced that amorphous silicon monoxide undergoes an unusual disproportionation by forming silicon- and silicon-dioxide-like regions. Nevertheless, the direct experimental observation is still missing. Here we report the amorphous structure characterized by angstrom-beam electron diffraction, supplemented by synchrotron X-ray scattering and computer simulations. In addition to the theoretically predicted amorphous silicon and silicon-dioxide clusters, suboxide-type tetrahedral coordinates are detected by angstrom-beam electron diffraction at silicon/silicon-dioxide interfaces, which provides compelling experimental evidence on the atomic-scale disproportionation of amorphous silicon monoxide. Eventually we develop a heterostructure model of the disproportionated silicon monoxide which well explains the distinctive structure and properties of the amorphous material. PMID:27172815

  11. Atomic-scale disproportionation in amorphous silicon monoxide

    Science.gov (United States)

    Hirata, Akihiko; Kohara, Shinji; Asada, Toshihiro; Arao, Masazumi; Yogi, Chihiro; Imai, Hideto; Tan, Yongwen; Fujita, Takeshi; Chen, Mingwei

    2016-01-01

    Solid silicon monoxide is an amorphous material which has been commercialized for many functional applications. However, the amorphous structure of silicon monoxide is a long-standing question because of the uncommon valence state of silicon in the oxide. It has been deduced that amorphous silicon monoxide undergoes an unusual disproportionation by forming silicon- and silicon-dioxide-like regions. Nevertheless, the direct experimental observation is still missing. Here we report the amorphous structure characterized by angstrom-beam electron diffraction, supplemented by synchrotron X-ray scattering and computer simulations. In addition to the theoretically predicted amorphous silicon and silicon-dioxide clusters, suboxide-type tetrahedral coordinates are detected by angstrom-beam electron diffraction at silicon/silicon-dioxide interfaces, which provides compelling experimental evidence on the atomic-scale disproportionation of amorphous silicon monoxide. Eventually we develop a heterostructure model of the disproportionated silicon monoxide which well explains the distinctive structure and properties of the amorphous material. PMID:27172815

  12. Light-induced metastable structural changes in hydrogenated amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Fritzsche, H. [Univ. of Chicago, IL (United States)

    1996-09-01

    Light-induced defects (LID) in hydrogenated amorphous silicon (a-Si:H) and its alloys limit the ultimate efficiency of solar panels made with these materials. This paper reviews a variety of attempts to find the origin of and to eliminate the processes that give rise to LIDs. These attempts include novel deposition processes and the reduction of impurities. Material improvements achieved over the past decade are associated more with the material`s microstructure than with eliminating LIDs. We conclude that metastable LIDs are a natural by-product of structural changes which are generally associated with non-radiative electron-hole recombination in amorphous semiconductors.

  13. Iron-based amorphous alloys and methods of synthesizing iron-based amorphous alloys

    Science.gov (United States)

    Saw, Cheng Kiong; Bauer, William A.; Choi, Jor-Shan; Day, Dan; Farmer, Joseph C.

    2016-05-03

    A method according to one embodiment includes combining an amorphous iron-based alloy and at least one metal selected from a group consisting of molybdenum, chromium, tungsten, boron, gadolinium, nickel phosphorous, yttrium, and alloys thereof to form a mixture, wherein the at least one metal is present in the mixture from about 5 atomic percent (at %) to about 55 at %; and ball milling the mixture at least until an amorphous alloy of the iron-based alloy and the at least one metal is formed. Several amorphous iron-based metal alloys are also presented, including corrosion-resistant amorphous iron-based metal alloys and radiation-shielding amorphous iron-based metal alloys.

  14. Annealing characteristics of amorphous silicon alloy solar cells irradiated with 1.00 MeV protons

    Science.gov (United States)

    Abdulaziz, Salman S.; Woodyard, James R.

    1991-01-01

    Amorphous Si:H and amorphous Si sub x, Ge sub (1-x):H solar cells were irradiated with 1.00 MeV proton fluences in the range of 1.00E14 to 1.25E15 cm (exp -2). Annealing of the short circuit current density was studied at 0, 22, 50, 100, and 150 C. Annealing times ranged from an hour to several days. The measurements confirmed that annealing occurs at 0 C and the initial characteristics of the cells are restored by annealing at 200 C. The rate of annealing does not appear to follow a simple nth order reaction rate model. Calculations of the short-circuit current density using quantum efficiency measurements and the standard AM1.5 global spectrum compare favorably with measured values. It is proposed that the degradation in J sub sc with irradiation is due to carrier recombination through the fraction of D (o) states bounded by the quasi-Fermi energies. The time dependence of the rate of annealing of J sub sc does appear to be consistent with the interpretation that there is a thermally activated dispersive transport mechanism which leads to the passivation of the irradiation induced defects.

  15. Roll-to-roll manufacturing of amorphous silicon alloy solar cells with in situ cell performance diagnostics

    International Nuclear Information System (INIS)

    In order to meet the price target necessary for widespread use of solar cell products, Energy Conversion Devices, Inc., ECD, has developed and commercialized a continuous roll-to-roll manufacturing technology for the production of a-Si alloy solar cells. Since the early 1980s, we have advanced this technology from a small-scale pilot machine to a large-scale production machine. In 2002, ECD commissioned a 30 MW per year machine for United Solar Systems Corp. in Auburn Hills, Michigan. The RF PECVD a-Si alloy solar cell processor, designed and built by ECD, deposits triple-junction solar cell materials consisting of nine layers of a-Si alloys in a continuous roll-to-roll operation simultaneously on six coils of 130 μm thick, 0.36 m wide, 2.6 km long stainless-steel substrate at 1 cm/s. In order to minimize production losses due to undetected deviations of production conditions and carry on a continuous program of device optimization, we have developed and are incorporating in situ cell performance diagnostic systems. (author)

  16. Amorphous silicon detectors in positron emission tomography

    Energy Technology Data Exchange (ETDEWEB)

    Conti, M. (Istituto Nazionale di Fisica Nucleare, Pisa (Italy) Lawrence Berkeley Lab., CA (USA)); Perez-Mendez, V. (Lawrence Berkeley Lab., CA (USA))

    1989-12-01

    The physics of the detection process is studied and the performances of different Positron Emission Tomography (PET) system are evaluated by theoretical calculation and/or Monte Carlo Simulation (using the EGS code) in this paper, whose table of contents can be summarized as follows: a brief introduction to amorphous silicon detectors and some useful equation is presented; a Tantalum/Amorphous Silicon PET project is studied and the efficiency of the systems is studied by Monte Carlo Simulation; two similar CsI/Amorphous Silicon PET projects are presented and their efficiency and spatial resolution are studied by Monte Carlo Simulation, light yield and time characteristics of the scintillation light are discussed for different scintillators; some experimental result on light yield measurements are presented; a Xenon/Amorphous Silicon PET is presented, the physical mechanism of scintillation in Xenon is explained, a theoretical estimation of total light yield in Xenon and the resulting efficiency is discussed altogether with some consideration of the time resolution of the system; the amorphous silicon integrated electronics is presented, total noise and time resolution are evaluated in each of our applications; the merit parameters {epsilon}{sup 2}{tau}'s are evaluated and compared with other PET systems and conclusions are drawn; and a complete reference list for Xenon scintillation light physics and its applications is presented altogether with the listing of the developed simulation programs.

  17. Amorphous silicon detectors in positron emission tomography

    International Nuclear Information System (INIS)

    The physics of the detection process is studied and the performances of different Positron Emission Tomography (PET) system are evaluated by theoretical calculation and/or Monte Carlo Simulation (using the EGS code) in this paper, whose table of contents can be summarized as follows: a brief introduction to amorphous silicon detectors and some useful equation is presented; a Tantalum/Amorphous Silicon PET project is studied and the efficiency of the systems is studied by Monte Carlo Simulation; two similar CsI/Amorphous Silicon PET projects are presented and their efficiency and spatial resolution are studied by Monte Carlo Simulation, light yield and time characteristics of the scintillation light are discussed for different scintillators; some experimental result on light yield measurements are presented; a Xenon/Amorphous Silicon PET is presented, the physical mechanism of scintillation in Xenon is explained, a theoretical estimation of total light yield in Xenon and the resulting efficiency is discussed altogether with some consideration of the time resolution of the system; the amorphous silicon integrated electronics is presented, total noise and time resolution are evaluated in each of our applications; the merit parameters ε2τ's are evaluated and compared with other PET systems and conclusions are drawn; and a complete reference list for Xenon scintillation light physics and its applications is presented altogether with the listing of the developed simulation programs

  18. Lithium concentration dependent structure and mechanics of amorphous silicon

    Science.gov (United States)

    Sitinamaluwa, H. S.; Wang, M. C.; Will, G.; Senadeera, W.; Zhang, S.; Yan, C.

    2016-06-01

    A better understanding of lithium-silicon alloying mechanisms and associated mechanical behavior is essential for the design of Si-based electrodes for Li-ion batteries. Unfortunately, the relationship between the dynamic mechanical response and microstructure evolution during lithiation and delithiation has not been well understood. We use molecular dynamic simulations to investigate lithiated amorphous silicon with a focus to the evolution of its microstructure, phase composition, and stress generation. The results show that the formation of LixSi alloy phase is via different mechanisms, depending on Li concentration. In these alloy phases, the increase in Li concentration results in reduction of modulus of elasticity and fracture strength but increase in ductility in tension. For a LixSi system with uniform Li distribution, volume change induced stress is well below the fracture strength in tension.

  19. Transverse and longitudinal vibrations in amorphous silicon

    Science.gov (United States)

    Beltukov, Y. M.; Fusco, C.; Tanguy, A.; Parshin, D. A.

    2015-12-01

    We show that harmonic vibrations in amorphous silicon can be decomposed to transverse and longitudinal components in all frequency range even in the absence of the well defined wave vector q. For this purpose we define the transverse component of the eigenvector with given ω as a component, which does not change the volumes of Voronoi cells around atoms. The longitudinal component is the remaining orthogonal component. We have found the longitudinal and transverse components of the vibrational density of states for numerical model of amorphous silicon. The vibrations are mostly transverse below 7 THz and above 15 THz. In the frequency interval in between the vibrations have a longitudinal nature. Just this sudden transformation of vibrations at 7 THz from almost transverse to almost longitudinal ones explains the prominent peak in the diffusivity of the amorphous silicon just above 7 THz.

  20. Atomic-scale disproportionation in amorphous silicon monoxide

    OpenAIRE

    Hirata, Akihiko; Kohara, Shinji; Asada, Toshihiro; Arao, Masazumi; Yogi, Chihiro; Imai, Hideto; Tan, Yongwen; Fujita, Takeshi; Chen, Mingwei

    2016-01-01

    Solid silicon monoxide is an amorphous material which has been commercialized for many functional applications. However, the amorphous structure of silicon monoxide is a long-standing question because of the uncommon valence state of silicon in the oxide. It has been deduced that amorphous silicon monoxide undergoes an unusual disproportionation by forming silicon- and silicon-dioxide-like regions. Nevertheless, the direct experimental observation is still missing. Here we report the amorphou...

  1. Crystallization of amorphous Zr-Be alloys

    Science.gov (United States)

    Golovkova, E. A.; Surkov, A. V.; Syrykh, G. F.

    2015-02-01

    The thermal stability and structure of binary amorphous Zr100 - x Be x alloys have been studied using differential scanning calorimetry and neutron diffraction over a wide concentration range (30 ≤ x ≤ 65). The amorphous alloys have been prepared by rapid quenching from melt. The studied amorphous system involves the composition range around the eutectic composition with boundary phases α-Zr and ZrBe2. It has been found that the crystallization of alloys with low beryllium contents ("hypoeutectic" alloys with x ≤ 40) proceeds in two stages. Neutron diffraction has demonstrated that, at the first stage, α-Zr crystallizes and the remaining amorphous phase is enriched to the eutectic composition; at the second stage, the alloy crystallizes in the α-Zr and ZrBe2 phases. At higher beryllium contents ("hypereutectic" alloys), one phase transition of the amorphous phase to a mixture of the α-Zr and ZrBe2 phases has been observed. The concentration dependences of the crystallization temperature and activation energy have been revealed.

  2. Neutron irradiation induced amorphization of silicon carbide

    Energy Technology Data Exchange (ETDEWEB)

    Snead, L.L.; Hay, J.C. [Oak Ridge National Lab., TN (United States)

    1998-09-01

    This paper provides the first known observation of silicon carbide fully amorphized under neutron irradiation. Both high purity single crystal hcp and high purity, highly faulted (cubic) chemically vapor deposited (CVD) SiC were irradiated at approximately 60 C to a total fast neutron fluence of 2.6 {times} 10{sup 25} n/m{sup 2}. Amorphization was seen in both materials, as evidenced by TEM, electron diffraction, and x-ray diffraction techniques. Physical properties for the amorphized single crystal material are reported including large changes in density ({minus}10.8%), elastic modulus as measured using a nanoindentation technique ({minus}45%), hardness as measured by nanoindentation ({minus}45%), and standard Vickers hardness ({minus}24%). Similar property changes are observed for the critical temperature for amorphization at this neutron dose and flux, above which amorphization is not possible, is estimated to be greater than 130 C.

  3. Neutron irradiation induced amorphization of silicon carbide

    International Nuclear Information System (INIS)

    This paper provides the first known observation of silicon carbide fully amorphized under neutron irradiation. Both high purity single crystal hcp and high purity, highly faulted (cubic) chemically vapor deposited (CVD) SiC were irradiated at approximately 60 C to a total fast neutron fluence of 2.6 x 1025 n/m2. Amorphization was seen in both materials, as evidenced by TEM, electron diffraction, and x-ray diffraction techniques. Physical properties for the amorphized single crystal material are reported including large changes in density (-10.8%), elastic modulus as measured using a nanoindentation technique (-45%), hardness as measured by nanoindentation (-45%), and standard Vickers hardness (-24%). Similar property changes are observed for the critical temperature for amorphization at this neutron dose and flux, above which amorphization is not possible, is estimated to be greater than 130 C

  4. Structural relaxation of amorphous silicon carbide

    International Nuclear Information System (INIS)

    We have examined amorphous structures of silicon carbide (SiC) using both transmission electron microscopy and a molecular-dynamics approach. Radial distribution functions revealed that amorphous SiC contains not only heteronuclear (Si-C) bonds but also homonuclear (Si-Si and C-C) bonds. The ratio of heteronuclear to homonuclear bonds was found to change upon annealing, suggesting that structural relaxation of the amorphous SiC occurred. Good agreement was obtained between the simulated and experimentally measured radial distribution functions

  5. Structural relaxation of amorphous silicon carbide.

    Science.gov (United States)

    Ishimaru, Manabu; Bae, In-Tae; Hirotsu, Yoshihiko; Matsumura, Syo; Sickafus, Kurt E

    2002-07-29

    We have examined amorphous structures of silicon carbide (SiC) using both transmission electron microscopy and a molecular-dynamics approach. Radial distribution functions revealed that amorphous SiC contains not only heteronuclear (Si-C) bonds but also homonuclear (Si-Si and C-C) bonds. The ratio of heteronuclear to homonuclear bonds was found to change upon annealing, suggesting that structural relaxation of the amorphous SiC occurred. Good agreement was obtained between the simulated and experimentally measured radial distribution functions. PMID:12144449

  6. Inverted amorphous silicon solar cell utilizing cermet layers

    Science.gov (United States)

    Hanak, Joseph J.

    1979-01-01

    An amorphous silicon solar cell incorporating a transparent high work function metal cermet incident to solar radiation and a thick film cermet contacting the amorphous silicon opposite to said incident surface.

  7. NMR INVESTIGATIONS OF HYDROGENATED AMORPHOUS SILICON

    OpenAIRE

    J. Reimer

    1981-01-01

    A review is presented of the N.M.R. (Nuclear Magnetic Resonance) studies to date of hydrogenated amorphous silicon-hydrogen films. Structural features of proton N.M.R. lineshapes, dynamics of hydrogen containing defect sites, and the promise of quantitative determinations of local silicon-hydrogen bonding environments are discussed in detail. Finally, some comments are given on future directions for N.M.R. studies of hydrogenated thin films.

  8. Stable Transistors in Hydrogenated Amorphous Silicon

    OpenAIRE

    J. M. Shannon

    2004-01-01

    Thin-film field-effect transistors in hydrogenated amorphous silicon are notoriously unstable due to the formation of silicon dangling bond trapping states in the accumulated channel region during operation. Here, we show that by using a source-gated transistor a major improvement in stability is obtained. This occurs because the electron quasi-Fermi level is pinned near the center of the band in the active source region of the device and strong accumulation of electrons is prevented. The use...

  9. The reliability and stability of multijunction amorphous silicon PV modules

    Energy Technology Data Exchange (ETDEWEB)

    Carlson, D.E. [Solarex, Newtown, PA (United States)

    1995-11-01

    Solarex is developing a manufacturing process for the commercial production of 8 ft{sup 2} multijunction amorphous silicon (a-Si) PV modules starting in 1996. The device structure used in these multijunction modules is: glass/textured tin oxide/p-i-n/p-i-n/ZnO/Al/EVA/Tedlar where the back junction of the tandem structure contains an amorphous silicon germanium alloy. As an interim step, 4 ft{sup 2} multijunction modules have been fabricated in a pilot production mode over the last several months. The distribution of initial conversion efficiencies for an engineering run of 67 modules (4 ft{sup 2}) is shown. Measurements recently performed at NREL indicate that the actual efficiencies are about 5% higher than those shown, and thus exhibit an average initial conversion efficiency of about 9.5%. The data indicates that the process is relatively robust since there were no modules with initial efficiencies less than 7.5%.

  10. Noise and degradation of amorphous silicon devices

    NARCIS (Netherlands)

    Bakker, J.P.R.

    2003-01-01

    Electrical noise measurements are reported on two devices of the disordered semiconductor hydrogenated amorphous silicon (a-Si:H). The material is applied in sandwich structures and in thin-film transistors (TFTs). In a sandwich configuration of an intrinsic layer and two thin doped layers, the obse

  11. Film adhesion in amorphous silicon solar cells

    Indian Academy of Sciences (India)

    A R M Yusoff; M N Syahrul; K Henkel

    2007-08-01

    A major issue encountered during fabrication of triple junction -Si solar cells on polyimide substrates is the adhesion of the solar cell thin films to the substrates. Here, we present our study of film adhesion in amorphous silicon solar cells made on different polyimide substrates (Kapton VN, Upilex-S and Gouldflex), and the effect of tie coats on film adhesion.

  12. Generation of correlated photons in hydrogenated amorphous-silicon waveguides

    OpenAIRE

    Clemmen, S.; Perret, A; Selvaraja, Shankar Kumar; Bogaerts, Wim; Van Thourhout, Dries; Baets, Roel; Emplit, Ph.; Massar, S.

    2011-01-01

    We report the first (to our knowledge) observation of correlated photon emission in hydrogenated amorphous- silicon waveguides. We compare this to photon generation in crystalline silicon waveguides with the same geome- try. In particular, we show that amorphous silicon has a higher nonlinearity and competes with crystalline silicon in spite of higher loss.

  13. Structural relaxation in amorphous silicon carbide

    International Nuclear Information System (INIS)

    High purity single crystal and chemically vapor deposited (CVD) silicon carbide have been amorphized under fast neutron irradiation. The gradual transition in physical properties from the as-amorphized state to a more relaxed amorphous state prior to crystallization is studied. For the three bulk properties studied: density, electrical resistivity, and thermal conductivity, large property changes occur upon annealing between the amorphization temperature and the point of crystallization. These physical property changes occur in the absence of crystallization and are attributed to short and perhaps medium range ordering during annealing. It is demonstrated that the physical properties of amorphous SiC (a-SiC) can vary greatly and are likely a function of the irradiation state producing the amorphization. The initiation of crystallization as measured using bulk density and in situ TEM is found to be ∼875 deg. C, though the kinetics of crystallization above this point are seen to depend on the technique used. It is speculated that in situ TEM and other thin-film approaches to study crystallization of amorphous SiC are flawed due to thin-film effects

  14. Ion bombardment and disorder in amorphous silicon

    International Nuclear Information System (INIS)

    The effect of ion bombardment during growth on the structural and optical properties of amorphous silicon are presented. Two series of films were deposited under electrically grounded and positively biased substrate conditions. The biased samples displayed lower growth rates and increased hydrogen content relative to grounded counterparts. The film structure was examined using Raman spectroscopy. The transverse optic like phonon band position was used as a parameter to characterize network order. Biased samples displayed an increased order of the amorphous network relative to grounded samples. Furthermore, biased samples exhibited a larger optical gap. These results are correlated and attributed to reduced ion bombardment effects

  15. Investigations on silicon/amorphous-carbon and silicon/nanocrystalline palladium/ amorphous-carbon interfaces.

    Science.gov (United States)

    Roy, M; Sengupta, P; Tyagi, A K; Kale, G B

    2008-08-01

    Our previous work revealed that significant enhancement in sp3-carbon content of amorphous carbon films could be achieved when grown on nanocrystalline palladium interlayer as compared to those grown on bare silicon substrates. To find out why, the nature of interface formed in both the cases has been investigated using Electron Probe Micro Analysis (EPMA) technique. It has been found that a reactive interface in the form of silicon carbide and/silicon oxy-carbide is formed at the interface of silicon/amorphous-carbon films, while palladium remains primarily in its native form at the interface of nanocrystalline palladium/amorphous-carbon films. However, there can be traces of dissolved oxygen within the metallic layer as well. The study has been corroborated further from X-ray photoelectron spectroscopic studies. PMID:19049221

  16. PHYSICAL PROPERTIES OF AMORPHOUS CVD SILICON

    OpenAIRE

    Hirose, M.

    1981-01-01

    Amorphous silicon produced from the chemical vapor decomposition of silane at ~600 °C offers a pure silicon network containing no bonded-hydrogen and involving native defects of the order of 1 x 1019 cm-3. Doped phosphorus or boron atoms in the CVD a-Si interact with the defects to reduce the gap states and the spin density as well. The mechanism of the defect compensation has been interpreted in terms of complex-defect formation through the reaction between three-fold dopant atoms and divaca...

  17. Self-Diffusion in Amorphous Silicon

    Science.gov (United States)

    Strauß, Florian; Dörrer, Lars; Geue, Thomas; Stahn, Jochen; Koutsioubas, Alexandros; Mattauch, Stefan; Schmidt, Harald

    2016-01-01

    The present Letter reports on self-diffusion in amorphous silicon. Experiments were done on 29Si/natSi heterostructures using neutron reflectometry and secondary ion mass spectrometry. The diffusivities follow the Arrhenius law in the temperature range between 550 and 700 °C with an activation energy of (4.4 ±0.3 ) eV . In comparison with single crystalline silicon the diffusivities are tremendously higher by 5 orders of magnitude at about 700 °C , which can be interpreted as the consequence of a high diffusion entropy.

  18. The Local Structure of Amorphous Silicon

    Science.gov (United States)

    Treacy, M. M. J.; Borisenko, K. B.

    2012-02-01

    It is widely believed that the continuous random network (CRN) model represents the structural topology of amorphous silicon. The key evidence is that the model can reproduce well experimental reduced density functions (RDFs) obtained by diffraction. By using a combination of electron diffraction and fluctuation electron microscopy (FEM) variance data as experimental constraints in a structural relaxation procedure, we show that the CRN is not unique in matching the experimental RDF. We find that inhomogeneous paracrystalline structures containing local cubic ordering at the 10 to 20 angstrom length scale are also fully consistent with the RDF data. Crucially, they also matched the FEM variance data, unlike the CRN model. The paracrystalline model has implications for understanding phase transformation processes in various materials that extend beyond amorphous silicon.

  19. Amorphous metallic films in silicon metallization systems

    Science.gov (United States)

    So, F.; Kolawa, E.; Nicolet, M. A.

    1985-01-01

    Diffusion barrier research was focussed on lowering the chemical reactivity of amorphous thin films on silicon. An additional area of concern is the reaction with metal overlays such as aluminum, silver, and gold. Gold was included to allow for technology transfer to gallium arsenide PV cells. Amorphous tungsten nitride films have shown much promise. Stability to annealing temperatures of 700, 800, and 550 C were achieved for overlays of silver, gold, and aluminum, respectively. The lower results for aluminum were not surprising because there is an eutectic that can form at a lower temperature. It seems that titanium and zirconium will remove the nitrogen from a tungsten nitride amorphous film and render it unstable. Other variables of research interest were substrate bias and base pressure during sputtering.

  20. Amorphous silicon for thin-film transistors

    OpenAIRE

    Schropp, Rudolf Emmanuel Isidore

    1987-01-01

    Hydrogenated amorphous silicon (a-Si:H) has considerable potential as a semiconducting material for large-area photoelectric and photovoltaic applications. Moreover, a-Si:H thin-film transistors (TFT’s) are very well suited as switching devices in addressable liquid crystal display panels and addressable image sensor arrays, due to a new technology of low-cost, Iow-temperature processing overlarge areas. ... Zie: Abstract

  1. Transverse and longitudinal vibrations in amorphous silicon

    OpenAIRE

    Beltukov, Y. M.; De Fusco, C; Tanguy, A.; Parshin, D. A.

    2015-01-01

    We show that harmonic vibrations in amorphous silicon can be decomposed to transverse and longitudinal components in all frequency range even in the absence of the well defined wave vector ${\\bf q}$. For this purpose we define the transverse component of the eigenvector with given $\\omega$ as a component, which does not change the volumes of Voronoi cells around atoms. The longitudinal component is the remaining orthogonal component. We have found the longitudinal and transverse components of...

  2. Amorphous silicon carbide films prepared using vaporized silicon ink

    Science.gov (United States)

    Masuda, Takashi; Shen, Zhongrong; Takagishi, Hideyuki; Ohdaira, Keisuke; Shimoda, Tatsuya

    2014-03-01

    The deposition of wide-band-gap silicon films using nonvacuum processes rather than conventional vacuum processes is of substantial interest because it may reduce cost. Herein, we present the optical and electrical properties of p-type hydrogenated amorphous silicon carbide (a-SiC:H) films prepared using a nonvacuum process in a simple chamber with a vaporized silicon ink consisting of cyclopentasilane, cyclohexene, and decaborane. The incorporation of carbon into the silicon network induced by the addition of cyclohexene to the silicon ink resulted in an increase in the optical band gap (Eg) of films from 1.56 to 2.11 eV. The conductivity of films with Eg 1.9 eV show lower conductivity than expected because of the incorporation of excess carbon without the formation of Si-C bonds.

  3. Polymeric amorphous carbon as p-type window within amorphous silicon solar cells

    NARCIS (Netherlands)

    Khan, R.U.A.; Silva, S.R.P.; Van Swaaij, R.A.C.M.M.

    2003-01-01

    Amorphous carbon (a-C) has been shown to be intrinsically p-type, and polymeric a-C (PAC) possesses a wide Tauc band gap of 2.6 eV. We have replaced the p-type amorphous silicon carbide layer of a standard amorphous silicon solar cell with an intrinsic ultrathin layer of PAC. The thickness of the p

  4. Nickel-induced crystallization of amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Schmidt, J A; Arce, R D; Buitrago, R H [INTEC (CONICET-UNL), Gueemes 3450, S3000GLN Santa Fe (Argentina); Budini, N; Rinaldi, P, E-mail: jschmidt@intec.unl.edu.a [FIQ - UNL, Santiago del Estero 2829, S3000AOM Santa Fe (Argentina)

    2009-05-01

    The nickel-induced crystallization of hydrogenated amorphous silicon (a-Si:H) is used to obtain large grained polycrystalline silicon thin films on glass substrates. a-Si:H is deposited by plasma enhanced chemical vapour deposition at 200 deg. C, preparing intrinsic and slightly p-doped samples. Each sample was divided in several pieces, over which increasing Ni concentrations were sputtered. Two crystallization methods are compared, conventional furnace annealing (CFA) and rapid thermal annealing (RTA). The crystallization was followed by optical microscopy and scanning electron microscopy observations, X-ray diffraction, and reflectance measurements in the UV region. The large grain sizes obtained - larger than 100{mu}m for the samples crystallized by CFA - are very encouraging for the preparation of low-cost thin film polycrystalline silicon solar cells.

  5. Soft magnetic amorphous Fe-Zr-Si(Cu) boron-free alloys

    International Nuclear Information System (INIS)

    Research highlights: → Amorphous Fe-Zr-Si(Cu) boron-free alloys were prepared by melt quenching. → Soft magnetic properties were investigated by the specialized rf-Moessbauer technique. → Dependence of coercivity and magnetization on alloy compositions was determined. - Abstract: Amorphous Fe80ZrxSi20-x-yCuy boron-free alloys, in which boron was completely replaced by silicon as a glass forming element, have been prepared in the form of ribbons by using the melt quenching technique. X-ray diffraction and Moessbauer spectroscopy measurements revealed that the as-quenched ribbons with the compositions with x = 6-10 at.% and y = 0, 1 at.% are fully or predominantly amorphous. Differential scanning calorimetry (DSC) measurements allowed the estimation of crystallization temperatures of the amorphous alloys. Soft magnetic properties have been studied by the specialized rf-Moessbauer technique. Since the rf-collapse effect observed is very sensitive to the local anisotropy fields it was possible to evaluate the soft magnetic properties of the amorphous alloys studied. The rf-Moessbauer studies were accompanied by conventional measurements of hysteresis loops from which the magnetization and coercive fields were estimated. It was found that amorphous Fe-Zr-Si(Cu) alloys are magnetically very soft, comparable with those of the conventional amorphous B-containing Fe-based alloys.

  6. Modelling the light induced metastable effects in amorphous silicon

    OpenAIRE

    Munyeme, G.; Chinyama, G.K.; Zeman, M.; R. E. I. Schropp; Weg, W

    2008-01-01

    We present results of computer simulations of the light induced degradation of amorphous silicon solar cells. It is now well established that when amorphous silicon is illuminated the density of dangling bond states increases. Dangling bond states produce amphoteric electronic mid-gap states which act as efficient charge trapping and recombination centres. The increase in dangling bond states causes a decrease in the performance of amorphous silicon solar cells. To show this effect, a modelli...

  7. Formation Range, Mechanical Properties and Thermal Stability of Superconducting Zr-Si Amorphous Alloys

    OpenAIRE

    Inoue, Akihisa; Takahashi, Yoshimi; MASUMOTO, Tsuyoshi

    1980-01-01

    New type of refractory metal-metalloid amorphous alloys containing less than 20 at% Si have been found in binary Zr-Si system by a modified melt-spinning technique for high melting point alloys. Specimens are in the form of continuous ribbons of 1-2 mm width and 0.02-0.03 mm thickness. The silicon content in the amorphous range is limited to the range 12 to 24 at%. The Vickers hardness increases from 395 to 495 DPN with increasing silicon content and the tensile strength is of the order of 14...

  8. Metal induced crystallization of silicon germanium alloys

    Energy Technology Data Exchange (ETDEWEB)

    Gjukic, M.

    2007-05-15

    In the framework of this thesis the applicability of the aluminium-induced layer exchange on binary silicon germanium alloys was studied. It is here for the first time shown that polycrstalline silicon-germanium layers can be fabricated over the whole composition range by the aluminium-induced layer exchange. The experimental results prove thet the resulting material exhibits a polycrystalline character with typocal grain sizes of 10-100 {mu}m. Raman measurements confirm that the structural properties of the resulting layers are because of the large crystallites more comparable with monocrystalline than with nano- or microcrystalline silicon-germanium. The alloy ratio of the polycrystalline layer correspondes to the chemical composition of the amorphous starting layer. The polycrystalline silicon-germanium layers possess in the range of the interband transitions a reflection spectrum, as it is otherwise only known from monocrystalline reference layers. The improvement of the absorption in the photovoltaically relevant spectral range aimed by the application of silicon-germanium could be also proved by absorption measurments. Strongly correlated with the structural properties of the polycrystalline layers and the electronic band structure resulting from this are beside the optical properties also the electrical properties of the material, especially the charge-carrier mobility and the doping concentration. For binary silicon-germanium layers the hole concentration of about 2 x 10{sup 18} cm{sup -3} for pure silicon increrases to about 5 x 10{sup 20} cm{sub -3} for pure germanium. Temperature-resolved measurements were applied in order to detect doping levels respectively semiconductor-metal transitions. In the last part of the thesis the hydrogen passivation of polycrystalline thin silicon-germanium layers, which were fabricated by means of aluminium-induced layer exchange, is treated.

  9. Superconducting State Parameters of Bulk Amorphous Alloys

    Directory of Open Access Journals (Sweden)

    Aditya M. Vora

    2012-12-01

    Full Text Available Well recognized empty core (EMC pseudopotential of Ashcroft is used to investigate the superconducting state parameters viz; electron-phonon coupling strength λ, Coulomb pseudopotential μ*, transition temperature TC, isotope effect exponent α and effective interaction strength NOV of some (Ni33Zr671 – xVx (x = 0, 0.05, 0.1, 0.15 bulk amorphous alloys. We have incorporated five different types of local field correction functions, proposed by Hartree (H, Taylor (T, Ichimaru-Utsumi (IU, Farid et al. (F and Sarkar et al. (S to show the effect of exchange and correlation on the aforesaid properties. Very strong influence of the various exchange and correlation functions is concluded from the present study. The TC obtained from Sarkar et al. (S local field correction function are found an excellent agreement with available theoretical data. Quadratic TC equation has been proposed, which provide successfully the TC values of bulk amorphous alloys under consideration. Also, the present results are found in qualitative agreement with other such earlier reported data, which confirms the superconducting phase in the s bulk amorphous alloys.

  10. Three-Terminal Amorphous Silicon Solar Cells

    OpenAIRE

    Cheng-Hung Tai; Chu-Hsuan Lin; Chih-Ming Wang; Chun-Chieh Lin

    2011-01-01

    Many defects exist within amorphous silicon since it is not crystalline. This provides recombination centers, thus reducing the efficiency of a typical a-Si solar cell. A new structure is presented in this paper: a three-terminal a-Si solar cell. The new back-to-back p-i-n/n-i-p structure increased the average electric field in a solar cell. A typical a-Si p-i-n solar cell was also simulated for comparison using the same thickness and material parameters. The 0.28 μm-thick three-terminal a-Si...

  11. Radiation resistance studies of amorphous silicon films

    Science.gov (United States)

    Woodyard, James R.; Payson, J. Scott

    1989-01-01

    Hydrogenated amorphous silicon thin films were irradiated with 2.00 MeV helium ions using fluences ranging from 1E11 to 1E15 cm(-2). The films were characterized using photothermal deflection spectroscopy and photoconductivity measurements. The investigations show that the radiation introduces sub-band-gap states 1.35 eV below the conduction band and the states increase supralinearly with fluence. Photoconductivity measurements suggest the density of states above the Fermi energy is not changing drastically with fluence.

  12. Amorphous silicon oxide window layers for high-efficiency silicon heterojunction solar cells

    OpenAIRE

    Seif, Johannes Peter; Descoeudres, Antoine; Filipic, Miha; Smole, Franc; Topic, Marko; Holman, Zachary Charles; De Wolf, Stefaan; Ballif, Christophe

    2014-01-01

    In amorphous/crystalline silicon heterojunction solar cells, optical losses can be mitigated by replacing the amorphous silicon films by wider bandgap amorphous silicon oxide layers. In this article, we use stacks of intrinsic amorphous silicon and amorphous silicon oxide as front intrinsic buffer layers and show that this increases the short-circuit current density by up to 0.43 mA/cm2 due to less reflection and a higher transparency at short wavelengths. Additionally, high open-circuit volt...

  13. Amorphous silicon-based microchannel plates

    International Nuclear Information System (INIS)

    Microchannel plates (MCP) based on hydrogenated amorphous silicon (a-Si:H) were recently introduced to overcome some of the limitations of crystalline silicon and glass MCP. The typical thickness of a-Si:H based MCPs (AMCP) ranges between 80 and 100 μm and the micromachining of the channels is realized by deep reactive ion etching (DRIE). Advantages and issues regarding the fabrication process are presented and discussed. Electron amplification is demonstrated and analyzed using Electron Beam Induced Current (EBIC) technique. The gain increases as a function of the bias voltage, limited to −340 V on account of high leakage currents across the structure. EBIC maps on 10° tilted samples confirm that the device active area extend to the entire channel opening. AMCP characterization with the electron beam shows gain saturation and signal quenching which depends on the effectiveness of the charge replenishment in the channel walls.

  14. Amorphous silicon-based microchannel plates

    Energy Technology Data Exchange (ETDEWEB)

    Franco, Andrea, E-mail: andrea.franco@epfl.ch [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin-film electronics laboratory, Breguet 2, CH-2000 Neuchatel (Switzerland); Riesen, Yannick; Wyrsch, Nicolas; Dunand, Sylvain [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin-film electronics laboratory, Breguet 2, CH-2000 Neuchatel (Switzerland); Powolny, Francois; Jarron, Pierre [European Organization for Nuclear Research (CERN), CH-1211 Geneva 23 (Switzerland); Ballif, Christophe [Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and thin-film electronics laboratory, Breguet 2, CH-2000 Neuchatel (Switzerland)

    2012-12-11

    Microchannel plates (MCP) based on hydrogenated amorphous silicon (a-Si:H) were recently introduced to overcome some of the limitations of crystalline silicon and glass MCP. The typical thickness of a-Si:H based MCPs (AMCP) ranges between 80 and 100 {mu}m and the micromachining of the channels is realized by deep reactive ion etching (DRIE). Advantages and issues regarding the fabrication process are presented and discussed. Electron amplification is demonstrated and analyzed using Electron Beam Induced Current (EBIC) technique. The gain increases as a function of the bias voltage, limited to -340 V on account of high leakage currents across the structure. EBIC maps on 10 Degree-Sign tilted samples confirm that the device active area extend to the entire channel opening. AMCP characterization with the electron beam shows gain saturation and signal quenching which depends on the effectiveness of the charge replenishment in the channel walls.

  15. Structure and magnetic properties of Fe-based amorphous alloys

    Directory of Open Access Journals (Sweden)

    K. Błoch

    2013-12-01

    Full Text Available Purpose: This paper presents studies relating to the structure, magnetic properties and thermal stability of the following bulk amorphous alloys: Fe61Co10Ti3-xY6+xB20 (where x = 0 or 1 Design/methodology/approach: The investigated samples were prepared in the form of rods by using the suction-casting method. The material structures were investigated using X-ray diffractometry and Mössbauer spectroscopy. The thermal stability was determined on the basis of Differential Scanning Calorimetry (DSC plots The magnetic properties were studied using a completely automated set up for measuring susceptibility and its disaccommodation. Findings: It was found that both alloys were amorphous in the as-cast state. The DSC curve obtained for Fe61Co10Ti2Y7B20 alloy exhibited one exothermic peak, while for the Fe61Co10Ti3Y6B20 sample, two peaks were distinguishable, corresponding to the crystallization of the sample. The bifurcation of the maximum on the DSC curve for the Fe61Co10Ti3Y6B20 sample may also testify to the presence of the primary crystallizing phase (FeCo23B6 [1,2]. Data obtained from the analysis of the magnetic susceptibility disaccommodation curves clearly show that in the Fe61Co10Ti3Y6B20 alloy there is less free volumes than in the second of the investigated alloys, this results in a lesser range of relaxation time. Moreover, Fe61Co10Ti3Y6B20 alloy exhibits the better time and thermal stability of magnetic properties In both of the studied alloys, at low frequencies, the total losses were comparable with those observed in classical silicon-iron alloys. Practical implications: A Ferrometer was used for the determination of core losses. Originality/value: The paper presents some researches of the Fe-based bulk amorphous alloys obtained by the suction-casting method.

  16. Niobium Silicon alloys for Kinetic Inductance Detectors

    CERN Document Server

    Calvo, M; Monfardini, A; Benoit, A; Boudou, N; Bourrion, O; Catalano, A; Dumoulin, L; Goupy, J; Sueur, H Le; Marnieros, S

    2013-01-01

    We are studying the properties of Niobium Silicon amorphous alloys as a candidate material for the fabrication of highly sensitive Kinetic Inductance Detectors (KID), optimized for very low optical loads. As in the case of other composite materials, the NbSi properties can be changed by varying the relative amounts of its components. Using a NbSi film with T_c around 1 K we have been able to obtain the first NbSi resonators, observe an optical response and acquire a spectrum in the band 50 to 300 GHz. The data taken show that this material has very high kinetic inductance and normal state surface resistivity. These properties are ideal for the development of KID. More measurements are planned to further characterize the NbSi alloy and fully investigate its potential.

  17. Endurance Tests Of Amorphous-Silicon Photovoltaic Modules

    Science.gov (United States)

    Ross, Ronald G., Jr.; Sugimura, Russell S.

    1989-01-01

    Failure mechanisms in high-power service studied. Report discusses factors affecting endurance of amorphous-silicon solar cells. Based on field tests and accelerated aging of photovoltaic modules. Concludes that aggressive research needed if amorphous-silicon modules to attain 10-year life - value U.S. Department of Energy established as goal for photovoltaic modules in commercial energy-generating plants.

  18. Modelling the light induced metastable effects in amorphous silicon

    NARCIS (Netherlands)

    Munyeme, G.; Chinyama, G.K.; Zeman, M.; Schropp, R.E.I.; van der Weg, W.

    2008-01-01

    We present results of computer simulations of the light induced degradation of amorphous silicon solar cells. It is now well established that when amorphous silicon is illuminated the density of dangling bond states increases. Dangling bond states produce amphoteric electronic mid-gap states which a

  19. Excessively High Vapor Pressure of Al-based Amorphous Alloys

    Directory of Open Access Journals (Sweden)

    Jae Im Jeong

    2015-10-01

    Full Text Available Aluminum-based amorphous alloys exhibited an abnormally high vapor pressure at their approximate glass transition temperatures. The vapor pressure was confirmed by the formation of Al nanocrystallites from condensation, which was attributed to weight loss of the amorphous alloys. The amount of weight loss varied with the amorphous alloy compositions and was inversely proportional to their glass-forming ability. The vapor pressure of the amorphous alloys around 573 K was close to the vapor pressure of crystalline Al near its melting temperature, 873 K. Our results strongly suggest the possibility of fabricating nanocrystallites or thin films by evaporation at low temperatures.

  20. Plasma deposition of amorphous metal alloys

    International Nuclear Information System (INIS)

    Rapid solidification, sputtering and electroless chemical deposition have been used to produce amorphous metal alloys which possess excellent corrosion and abrasion resistance. This paper discusses a new technique for obtaining amorphous metal alloy coatings. Plasma decomposition of Ni(CO)4 and PH3 in argon and hydrogen carrier gases [Ni(CO4/PH3--8/1] yielded films that were black and silver, respectively, in appearance. Both films were amorphous as determined by transmission electron microscopy. Films deposited using a hydrogen carrier gas were three orders of magnitude more conductive than those deposited using an argon carrier gas. Analysis of both films using electron microprobe analysis and inductively-coupled plasma spectroscopy showed an enrichment of P in the films over the P content in the plasma gas mixtures. Reducing the P content of the plasma gas mixture [Ni(CO)4/PH3--17/11 yielded crystalline films with no P enrichment. The grain size in these films was --60Δ as determined by x-ray line-broadening

  1. An infrared and luminescence study of tritiated amorphous silicon

    International Nuclear Information System (INIS)

    Tritium has been incorporated into amorphous silicon. Infrared spectroscopy shows new infrared vibration modes due to silicon-tritium (Si-T) bonds in the amorphous silicon network. Si-T vibration frequencies are related to Si-H vibration frequencies by simple mass relationships. Inelastic collisions of β particles, produced as a result of tritium decay, with the amorphous silicon network results in the generation of electron-hole pairs. Radiative recombination of these carriers is observed. Dangling bonds associated with the tritium decay reduce luminescence efficiency

  2. A STUDY OF TIN IMPURITY ATOMS IN AMORPHOUS SILICON

    OpenAIRE

    Rabchanova, Tatiana

    2013-01-01

    Using the Mössbauer spectroscopy method for the 119 Sn isotope the state of tin impurity atoms in amorphous a-Si silicon is studied. The electrical and optical properties of tin doped films of thermally spray-coated amorphous silicon have been studied. It is shown that in contrast to the crystalline silicon where tin is an electrically inactive substitution impurity, in vacuum deposited amorphous silicon it produces an acceptor band near the valence band and a fraction of the tin atoms become...

  3. Tribological properties of amorphous alloys and the role of surfaces in abrasive wear of materials

    Science.gov (United States)

    Miyoshi, K.; Buckley, D. H.

    1982-01-01

    The research approach undertaken by the authors relative to the subject, and examples of results from the authors are reviewed. The studies include programs in adhesion, friction, and various wear mechanisms (adhesive and abrasive wear). The materials which have been studied include such ceramic and metallic materials as silicon carbide, ferrites, diamond, and amorphous alloys.

  4. Amorphous Alloy Surpasses Steel and Titanium

    Science.gov (United States)

    2004-01-01

    In the same way that the inventions of steel in the 1800s and plastic in the 1900s sparked revolutions for industry, a new class of amorphous alloys is poised to redefine materials science as we know it in the 21st century. Welcome to the 3rd Revolution, otherwise known as the era of Liquidmetal(R) alloys, where metals behave similar to plastics but possess more than twice the strength of high performance titanium. Liquidmetal alloys were conceived in 1992, as a result of a project funded by the California Institute of Technology (CalTech), NASA, and the U.S. Department of Energy, to study the fundamentals of metallic alloys in an undercooled liquid state, for the development of new aerospace materials. Furthermore, NASA's Marshall Space Flight Center contributed to the development of the alloys by subjecting the materials to testing in its Electrostatic Levitator, a special instrument that is capable of suspending an object in midair so that researchers can heat and cool it in a containerless environment free from contaminants that could otherwise spoil the experiment.

  5. Composition Range of Amorphous Mg-Ni-Y Alloys

    Institute of Scientific and Technical Information of China (English)

    陈红梅; 钟夏平; 欧阳义芳

    2003-01-01

    Based on the thermodynamic point of view, a method for predication of the composition range of amorphous ternary alloys was proposed. The composition range of amorphous ternary alloys is determined by the comparison of the excess free energy of the amorphous alloy and the free energy of competing crystalline states. The free energy is extrapolated from the data of three binary alloys by using Toop′s model. The method was applied to predict the composition range of amorphous Mg-Ni-Y alloys. The theoretical results are in good agreement with the available experimental results. It indicates that the present method can be used to predict the composition range for amorphous ternary alloys.

  6. Amorphous silicon carbide passivating layers for crystalline-silicon-based heterojunction solar cells

    International Nuclear Information System (INIS)

    Amorphous silicon enables the fabrication of very high-efficiency crystalline-silicon-based solar cells due to its combination of excellent passivation of the crystalline silicon surface and permeability to electrical charges. Yet, amongst other limitations, the passivation it provides degrades upon high-temperature processes, limiting possible post-deposition fabrication possibilities (e.g., forcing the use of low-temperature silver pastes). We investigate the potential use of intrinsic amorphous silicon carbide passivating layers to sidestep this issue. The passivation obtained using device-relevant stacks of intrinsic amorphous silicon carbide with various carbon contents and doped amorphous silicon are evaluated, and their stability upon annealing assessed, amorphous silicon carbide being shown to surpass amorphous silicon for temperatures above 300 °C. We demonstrate open-circuit voltage values over 700 mV for complete cells, and an improved temperature stability for the open-circuit voltage. Transport of electrons and holes across the hetero-interface is studied with complete cells having amorphous silicon carbide either on the hole-extracting side or on the electron-extracting side, and a better transport of holes than of electrons is shown. Also, due to slightly improved transparency, complete solar cells using an amorphous silicon carbide passivation layer on the hole-collecting side are demonstrated to show slightly better performances even prior to annealing than obtained with a standard amorphous silicon layer

  7. Amorphous silicon carbide passivating layers for crystalline-silicon-based heterojunction solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Boccard, Mathieu; Holman, Zachary C. [School of Electrical, Computer, and Energy Engineering, Arizona State University, Tempe, Arizona 85287-5706 (United States)

    2015-08-14

    Amorphous silicon enables the fabrication of very high-efficiency crystalline-silicon-based solar cells due to its combination of excellent passivation of the crystalline silicon surface and permeability to electrical charges. Yet, amongst other limitations, the passivation it provides degrades upon high-temperature processes, limiting possible post-deposition fabrication possibilities (e.g., forcing the use of low-temperature silver pastes). We investigate the potential use of intrinsic amorphous silicon carbide passivating layers to sidestep this issue. The passivation obtained using device-relevant stacks of intrinsic amorphous silicon carbide with various carbon contents and doped amorphous silicon are evaluated, and their stability upon annealing assessed, amorphous silicon carbide being shown to surpass amorphous silicon for temperatures above 300 °C. We demonstrate open-circuit voltage values over 700 mV for complete cells, and an improved temperature stability for the open-circuit voltage. Transport of electrons and holes across the hetero-interface is studied with complete cells having amorphous silicon carbide either on the hole-extracting side or on the electron-extracting side, and a better transport of holes than of electrons is shown. Also, due to slightly improved transparency, complete solar cells using an amorphous silicon carbide passivation layer on the hole-collecting side are demonstrated to show slightly better performances even prior to annealing than obtained with a standard amorphous silicon layer.

  8. Amorphous silicon carbide passivating layers for crystalline-silicon-based heterojunction solar cells

    Science.gov (United States)

    Boccard, Mathieu; Holman, Zachary C.

    2015-08-01

    Amorphous silicon enables the fabrication of very high-efficiency crystalline-silicon-based solar cells due to its combination of excellent passivation of the crystalline silicon surface and permeability to electrical charges. Yet, amongst other limitations, the passivation it provides degrades upon high-temperature processes, limiting possible post-deposition fabrication possibilities (e.g., forcing the use of low-temperature silver pastes). We investigate the potential use of intrinsic amorphous silicon carbide passivating layers to sidestep this issue. The passivation obtained using device-relevant stacks of intrinsic amorphous silicon carbide with various carbon contents and doped amorphous silicon are evaluated, and their stability upon annealing assessed, amorphous silicon carbide being shown to surpass amorphous silicon for temperatures above 300 °C. We demonstrate open-circuit voltage values over 700 mV for complete cells, and an improved temperature stability for the open-circuit voltage. Transport of electrons and holes across the hetero-interface is studied with complete cells having amorphous silicon carbide either on the hole-extracting side or on the electron-extracting side, and a better transport of holes than of electrons is shown. Also, due to slightly improved transparency, complete solar cells using an amorphous silicon carbide passivation layer on the hole-collecting side are demonstrated to show slightly better performances even prior to annealing than obtained with a standard amorphous silicon layer.

  9. Optical limiting in hydrogenated amorphous silicon-selenium thin films

    Energy Technology Data Exchange (ETDEWEB)

    Manaa, Hacene, E-mail: hmanaa@gmail.co [Physics Department, Kuwait University, P.O. Box 5969, Safat 13060 (Kuwait); Al-Mulla, Abdullah; Al-Jamal, Noor [Physics Department, Kuwait University, P.O. Box 5969, Safat 13060 (Kuwait); Al-Dallal, Shawqi; Al-Alawi, Saleh [Physics Department, University of Bahrain, P.O. Box 32038 (Bahrain)

    2010-05-03

    Hydrogenated amorphous silicon-selenium alloy thin films grown by capacitively coupled radio-frequency glow-discharge are investigated. Nonlinear absorptive effects are evaluated with the help of open aperture z-scan technique in the 525 to 580 nm spectral range. The nonlinear absorption coefficient is found to be very large and reaching the value of 5.14 x 10{sup -3} cm/W at 525 nm. The origin of the optical nonlinearities is studied and found to be due mainly to two photon absorption in the case of pulsed excitation, whereas thermal effects are thought to be dominant when the sample is excited with a continuous wave laser. Optical limiting potentialities of the thin film are experimentally observed and their thresholds are found to be very low.

  10. Dynamics of hydrogen in hydrogenated amorphous silicon

    Indian Academy of Sciences (India)

    Ranber Singh; S Prakash

    2003-07-01

    The problem of hydrogen diffusion in hydrogenated amorphous silicon (a-Si:H) is studied semiclassically. It is found that the local hydrogen concentration fluctuations-induced extra potential wells, if intense enough, lead to the localized electronic states in a-Si:H. These localized states are metastable. The trapping of electrons and holes in these states leads to the electrical degradation of the material. These states also act as recombination centers for photo-generated carriers (electrons and holes) which in turn may excite a hydrogen atom from a nearby Si–H bond and breaks the weak (strained) Si–Si bond thereby apparently enhancing the hydrogen diffusion and increasing the light-induced dangling bonds.

  11. Three-Terminal Amorphous Silicon Solar Cells

    Directory of Open Access Journals (Sweden)

    Cheng-Hung Tai

    2011-01-01

    Full Text Available Many defects exist within amorphous silicon since it is not crystalline. This provides recombination centers, thus reducing the efficiency of a typical a-Si solar cell. A new structure is presented in this paper: a three-terminal a-Si solar cell. The new back-to-back p-i-n/n-i-p structure increased the average electric field in a solar cell. A typical a-Si p-i-n solar cell was also simulated for comparison using the same thickness and material parameters. The 0.28 μm-thick three-terminal a-Si solar cell achieved an efficiency of 11.4%, while the efficiency of a typical a-Si p-i-n solar cell was 9.0%. Furthermore, an efficiency of 11.7% was achieved by thickness optimization of the three-terminal solar cell.

  12. Amorphous Silicon-Carbon Nanostructure Solar Cells

    Science.gov (United States)

    Schriver, Maria; Regan, Will; Loster, Matthias; Zettl, Alex

    2011-03-01

    Taking advantage of the ability to fabricate large area graphene and carbon nanotube networks (buckypaper), we produce Schottky junction solar cells using undoped hydrogenated amorphous silicon thin films and nanostructured carbon films. These films are useful as solar cell materials due their combination of optical transparency and conductance. In our cells, they behave both as a transparent conductor and as an active charge separating layer. We demonstrate a reliable photovoltaic effect in these devices with a high open circuit voltage of 390mV in buckypaper devices. We investigate the unique interface properties which result in an unusual J-V curve shape and optimize fabrication processes for improved solar conversion efficiency. These devices hold promise as a scalable solar cell made from earth abundant materials and without toxic and expensive doping processes.

  13. Short range atomic migration in amorphous silicon

    Science.gov (United States)

    Strauß, F.; Jerliu, B.; Geue, T.; Stahn, J.; Schmidt, H.

    2016-05-01

    Experiments on self-diffusion in amorphous silicon between 400 and 500 °C are presented, which were carried out by neutron reflectometry in combination with 29Si/natSi isotope multilayers. Short range diffusion is detected on a length scale of about 2 nm, while long range diffusion is absent. Diffusivities are in the order of 10-19-10-20 m2/s and decrease with increasing annealing time, reaching an undetectable low value for long annealing times. This behavior is strongly correlated to structural relaxation and can be explained as a result of point defect annihilation. Diffusivities for short annealing times of 60 s follow the Arrhenius law with an activation enthalpy of (0.74 ± 0.21) eV, which is interpreted as the activation enthalpy of Si migration.

  14. Tunable plasticity in amorphous silicon carbide films.

    Science.gov (United States)

    Matsuda, Yusuke; Kim, Namjun; King, Sean W; Bielefeld, Jeff; Stebbins, Jonathan F; Dauskardt, Reinhold H

    2013-08-28

    Plasticity plays a crucial role in the mechanical behavior of engineering materials. For instance, energy dissipation during plastic deformation is vital to the sufficient fracture resistance of engineering materials. Thus, the lack of plasticity in brittle hybrid organic-inorganic glasses (hybrid glasses) often results in a low fracture resistance and has been a significant challenge for their integration and applications. Here, we demonstrate that hydrogenated amorphous silicon carbide films, a class of hybrid glasses, can exhibit a plasticity that is even tunable by controlling their molecular structure and thereby leads to an increased and adjustable fracture resistance in the films. We decouple the plasticity contribution from the fracture resistance of the films by estimating the "work-of-fracture" using a mean-field approach, which provides some insight into a potential connection between the onset of plasticity in the films and the well-known rigidity percolation threshold. PMID:23876200

  15. Amorphous Silicon Display Backplanes on Plastic Substrates

    Science.gov (United States)

    Striakhilev, Denis; Nathan, Arokia; Vygranenko, Yuri; Servati, Peyman; Lee, Czang-Ho; Sazonov, Andrei

    2006-12-01

    Amorphous silicon (a-Si) thin-film transistor (TFT) backplanes are very promising for active-matrix organic light-emitting diode displays (AMOLEDs) on plastic. The technology benefits from a large manufacturing base, simple fabrication process, and low production cost. The concern lies in the instability of the TFTs threshold voltage (VT) and its low device mobility. Although VT-instability can be compensated by means of advanced multi-transistor pixel circuits, the lifetime of the display is still dependent on the TFT process quality and bias conditions. A-Si TFTs with field-effect mobility of 1.1 cm2/V · s and pixel driver circuits have been fabricated on plastic substrates at 150 °C. The circuits are characterized in terms of current drive capability and long-term stability of operation. The results demonstrate sufficient and stable current delivery and the ability of the backplane on plastic to meet AMOLED requirements.

  16. Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films

    OpenAIRE

    Voz Sánchez, Cristóbal; Martin, I.; Orpella, A.; Puigdollers i González, Joaquim; Vetter, M.; Alcubilla González, Ramón; Soler Vilamitjana, David; Fonrodona Turon, Marta; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi

    2003-01-01

    In this work, we study the electronic surface passivation of crystalline silicon with intrinsic thin silicon films deposited by Catalytic CVD. The contactless method used to determine the effective surface recombination velocity was the quasi-steady-state photoconductance technique. Hydrogenated amorphous and nanocrystalline silicon films were evaluated as passivating layers on n- and p-type float zone silicon wafers. The best results were obtained with amorphous silicon films, which allowed ...

  17. Stable, high-efficiency amorphous silicon solar cells with low hydrogen content

    Science.gov (United States)

    Fortmann, C. M.; Hegedus, S. S.

    1992-12-01

    Results and conclusions obtained during the investigation of amorphous silicon, amorphous silicon based alloy materials, and solar cells fabricated by photo-chemical vapor and glow discharge depositions are reported. Investigation of the effects of the hydrogen content in a-Si:H i-layers in amorphous silicon solar cells show that cells with lowered hydrogen content i-layers are more stable. A classical thermodynamic formulation of the Staebler-Wronski effect has been developed for standard solar cell operating temperatures and illuminations. Methods have been developed to extract a lumped equivalent circuit from the current voltage characteristic of a single junction solar cell in order to predict its behavior in a multijunction device.

  18. Ion beam irradiation of relaxed amorphous silicon carbide

    International Nuclear Information System (INIS)

    In-situ transmittance measurements at λ=633 nm are used during ion irradiation to probe the defect generation in relaxed amorphous silicon carbide (SiC). The optical constants of amorphous SiC are strongly correlated to the thermal history of the material and the transmittance of ion implanted amorphous SiC (unrelaxed amorphous) increases after annealing in the temperature range 100-700 deg. C. The transmittance of annealed amorphous SiC (relaxed) during subsequent implantation decreases and saturates to the value of unrelaxed amorphous. In-situ transmittance measurements allow to follow directly the defect generation and to measure the fluence at which the transmittance saturates (derelaxation fluence). The effect of different ions (He and Ar) on these phenomena is explored. The obtained results are compared and discussed with similar measurements performed on amorphous silicon

  19. NMR study in amorphous CoZr thin film alloys

    International Nuclear Information System (INIS)

    59Co NMR study has been carried out in a series of magnetic thin film amorphous Co1-xZrx alloys in the concentration range 0.1< x<0.4. The analysis shows that every Zr nearest neighbour lowers the NMR frequency on Co in the amorphous CoZr alloys by about 30 MHz and that the alloy structure in Co-rich compositions resembles the polytetrahedrally closed packed crystalline phases. (orig.)

  20. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon.

    Science.gov (United States)

    Ben Slama, Sonia; Hajji, Messaoud; Ezzaouia, Hatem

    2012-01-01

    Porous silicon layers were elaborated by electrochemical etching of heavily doped p-type silicon substrates. Metallization of porous silicon was carried out by immersion of substrates in diluted aqueous solution of nickel. Amorphous silicon thin films were deposited by plasma-enhanced chemical vapor deposition on metalized porous layers. Deposited amorphous thin films were crystallized under vacuum at 750°C. Obtained results from structural, optical, and electrical characterizations show that thermal annealing of amorphous silicon deposited on Ni-metalized porous silicon leads to an enhancement in the crystalline quality and physical properties of the silicon thin films. The improvement in the quality of the film is due to the crystallization of the amorphous film during annealing. This simple and easy method can be used to produce silicon thin films with high quality suitable for thin film solar cell applications. PMID:22901341

  1. Proton NMR studies of PECVD hydrogenated amorphous silicon films and HWCVD hydrogenated amorphous silicon films

    Science.gov (United States)

    Herberg, Julie Lynn

    This dissertation discusses a new understanding of the internal structure of hydrogenated amorphous silicon. Recent research in our group has included nuclear spin echo double resonance (SEDOR) measurements on device quality hydrogenated amorphous silicon photovoltaic films. Using the SEDOR pulse sequence with and without the perturbing 29Si pulse, we obtain Fourier transform spectra for film at 80K that allows us to distinguish between molecular hydrogen and hydrogen bonded to silicon. Using such an approach, we have demonstrated that high quality a-Si:H films produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) from SiH 4 contains about ten atomic percent hydrogen, nearly 40% of which is molecular hydrogen, individually trapped in the amorphous equivalent of tetragonal sites (T-sites). The main objective of this dissertation is to examine the difference between a-Si:H made by PECVD techniques and a-Si:H made by Hot Wire Chemical Vapor Deposition (HWCVD) techniques. Proton NMR and 1H- 29Si SEDOR NMR are used to examine the hydrogen structure of HWCVD a-Si:H films prepared at the University of Utrecht and at the National Renewable Energy Laboratory (NREL). Past NMR studies have shown that high quality PECVD a-Si:H films have geometries in which 40% of the contained hydrogen is present as H2 molecules individually trapped in the amorphous equivalent of T-sites. A much smaller H2 fraction sometimes is physisorbed on internal surfaces. In this dissertation, similar NMR methods are used to perform structural studies of the two HWCVD aSi:H samples. The 3kHz resonance line from T-site-trapped H2 molecules shows a hole-burn behavior similar to that found for PECVD a-Si:H films as does the 24kHz FWHM line from clustered hydrogen bonded to silicon. Radio frequency hole-burning is a tool to distinguish between inhomogenous and homogeneous broadening. In the hole-burn experiments, the 3kHz FWHM resonance line from T-site-trapped H2 molecules shows a hole

  2. Unexpected magnetic behavior in amorphous Co90Sc10 alloy

    International Nuclear Information System (INIS)

    An amorphous alloy Co90Sc10 has been prepared by rapid quenching from the melt. The results of magnetization measurements show that this alloy has the highest Curie temperature reported for any amorphous transition metal based alloys. Furthermore, for a Co based amorphous alloy, the magnetic moment is remarkably high. Moreover, the alloy exhibits soft magnetic properties. Based on the findings, amorphous Co90Sc10 appears to be an attractive candidate for applications as a soft magnetic material. The temperature dependence of the reduced magnetization can be described by the Bloch power law. The results show that the B coefficient of the amorphous Co90Sc10 alloy, which is a measure of the rigidity of spin waves, exhibits the lowest value observed until now for any amorphous alloy and is comparable to crystalline alloys. It is found that the Sc atoms in the Co90Sc10 alloy lead to an increase of the itinerant spin moment of Co atoms, and, in contrast to this behaviour, to a decrease of the local 3d-electrons of Co

  3. Laser annealing of amorphous silicon core optical fibers

    OpenAIRE

    Healy, N; Mailis, S.; Day, T. D.; Sazio, P.J.A.; Badding, J. V.; A.C. Peacock

    2012-01-01

    Laser annealing of an optical fiber with an amorphous silicon core is demonstrated. The annealing process produces a fiber that has a highly crystalline core, whilst reducing the optical transmission losses by ~3 orders of magnitude.

  4. Nanocavity Shrinkage and Preferential Amorphization during Irradiation in Silicon

    Institute of Scientific and Technical Information of China (English)

    ZHU Xian-Fang; WANG Zhan-Guo

    2005-01-01

    @@ We model the recent experimental results and demonstrate that the internal shrinkage of nanocavities in silicon is intrinsically associated with preferential amorphization as induced by self-ion irradiation.

  5. Thermal properties of amorphous/crystalline silicon superlattices.

    Science.gov (United States)

    France-Lanord, Arthur; Merabia, Samy; Albaret, Tristan; Lacroix, David; Termentzidis, Konstantinos

    2014-09-01

    Thermal transport properties of crystalline/amorphous silicon superlattices using molecular dynamics are investigated. We show that the cross-plane conductivity of the superlattices is very low and close to the conductivity of bulk amorphous silicon even for amorphous layers as thin as ≃ 6 Å. The cross-plane thermal conductivity weakly increases with temperature which is associated with a decrease of the Kapitza resistance with temperature at the crystalline/amorphous interface. This property is further investigated considering the spatial analysis of the phonon density of states in domains close to the interface. Interestingly, the crystalline/amorphous superlattices are shown to display large thermal anisotropy, according to the characteristic sizes of elaborated structures. These last results suggest that the thermal conductivity of crystalline/amorphous superlattices can be phonon engineered, providing new directions for nanostructured thermoelectrics and anisotropic materials in thermal transport. PMID:25105883

  6. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon

    OpenAIRE

    Ben Slama, Sonia; Hajji, Messaoud; Ezzaouia, Hatem

    2012-01-01

    Porous silicon layers were elaborated by electrochemical etching of heavily doped p-type silicon substrates. Metallization of porous silicon was carried out by immersion of substrates in diluted aqueous solution of nickel. Amorphous silicon thin films were deposited by plasma-enhanced chemical vapor deposition on metalized porous layers. Deposited amorphous thin films were crystallized under vacuum at 750°C. Obtained results from structural, optical, and electrical characterizations show that...

  7. Structure and Optical Properties of Silicon Nanocrystals Embedded in Amorphous Silicon Thin Films Obtained by PECVD

    OpenAIRE

    Monroy, B. M.; Aduljay Remolina Millán; García-Sánchez, M. F.; Ponce, A.; Picquart, M.; Santana, G.

    2011-01-01

    Silicon nanocrystals embedded in amorphous silicon matrix were obtained by plasma enhanced chemical vapor deposition using dichlorosilane as silicon precursor. The RF power and dichlorosilane to hydrogen flow rate ratio were varied to obtain different crystalline fractions and average sizes of silicon nanocrystals. High-resolution transmission electron microscopy images and RAMAN measurements confirmed the existence of nanocrystals embedded in the amorphous matrix with average sizes between 2...

  8. Interaction of hydrogenated amorphous silicon films with transparent conductive films

    OpenAIRE

    Kitagawa, M.; Mori, K; Ishihara, S.; Ohno, M.; Hirao, T.; Yoshioka, Y.; Kohiki, S

    1983-01-01

    The effects of the deposition temperature on the interaction of the hydrogenated amorphous silicon films with indium-tin-oxide and tin-oxide films have been investigated in the temperature range 150-300 degrees C, using Auger electron spectroscopy, secondary ion mass spectrometry, and scanning electron microscopy. It was found that the constituent atoms such as indium and tin are detected in the thin amorphous silicon films deposited. Around the interface between the transparent conductive fi...

  9. PHOTOEMISSION STUDIES OF THE TRANSITION FROM AMORPHOUS TO MICROCRYSTALLINE SILICON

    OpenAIRE

    Richter, H.; Ley, L.

    1981-01-01

    We have studied a series of samples spanning the range from purely amorphous to microcrystalline silicon prepared by chemical transport in a hydrogen plasma or by sputtering in a H2/Ar mixture. The first order Raman spectra show a superposition of amorphous and crystalline contribution, showing some features of wurtzite-silicon. The electronic density of states, as deduced from X-ray photoelectron-spectroscopy, shows a gradual change from microcrystalline structure for samples prepared by che...

  10. Experimentally Constrained Molecular Relaxation: The case of hydrogenated amorphous silicon

    OpenAIRE

    Biswas, Parthapratim; Atta-Fynn, Raymond; Drabold, David A.

    2007-01-01

    We have extended our experimentally constrained molecular relaxation technique (P. Biswas {\\it et al}, Phys. Rev. B {\\bf 71} 54204 (2005)) to hydrogenated amorphous silicon: a 540-atom model with 7.4 % hydrogen and a 611-atom model with 22 % hydrogen were constructed. Starting from a random configuration, using physically relevant constraints, {\\it ab initio} interactions and the experimental static structure factor, we construct realistic models of hydrogenated amorphous silicon. Our models ...

  11. Amorphous Silicon: Flexible Backplane and Display Application

    Science.gov (United States)

    Sarma, Kalluri R.

    Advances in the science and technology of hydrogenated amorphous silicon (a-Si:H, also referred to as a-Si) and the associated devices including thin-film transistors (TFT) during the past three decades have had a profound impact on the development and commercialization of major applications such as thin-film solar cells, digital image scanners and X-ray imagers and active matrix liquid crystal displays (AMLCDs). Particularly, during approximately the past 15 years, a-Si TFT-based flat panel AMLCDs have been a huge commercial success. a-Si TFT-LCD has enabled the note book PCs, and is now rapidly replacing the venerable CRT in the desktop monitor and home TV applications. a-Si TFT-LCD is now the dominant technology in use for applications ranging from small displays such as in mobile phones to large displays such as in home TV, as well-specialized applications such as industrial and avionics displays.

  12. Formation and Corrosion Resistance of Amorphous Ti Base Alloys

    OpenAIRE

    Naka, M.; Okada, T.; T. Matsui

    1996-01-01

    Corrosion resistant amorphous Ti-B and Ti-Si alloys were prepared on various substrates by RF sputtering. The alloying of B content of 8 at% or more stabilizes the amorphous structure. The corrosion properties of Ti alloys were evaluated by measuring the polarization curves in 1N HCl. Although the addition of B to crystalline bulky Ti shifts the corrosion potentials of Ti to the less nobles of -0.5 V(SCE) or less, that of B to amorphous sputtered Ti moves the corrosion potentials to the noble...

  13. Anharmonic Decay of Vibrational States in Amorphous Silicon

    OpenAIRE

    Fabian, Jaroslav; Allen, Philip B.

    1996-01-01

    Anharmonic decay rates are calculated for a realistic atomic model of amorphous silicon. The results show that the vibrational states decay on picosecond timescales and follow the two-mode density of states, similar to crystalline silicon, but somewhat faster. Surprisingly little change occurs for localized states. These results disagree with a recent experiment.

  14. Polymeric amorphous carbon as p-type window within amorphous silicon solar cells

    OpenAIRE

    Khan, R U A; Silva, S. R. P.; Van Swaaij, R.A.C.M.M.

    2003-01-01

    Amorphous carbon (a-C) has been shown to be intrinsically p-type, and polymeric a-C (PAC) possesses a wide Tauc band gap of 2.6 eV. We have replaced the p-type amorphous silicon carbide layer of a standard amorphous silicon solar cell with an intrinsic ultrathin layer of PAC. The thickness of the p layer had to be reduced from 9 to 2.5 nm in order to ensure sufficient conduction through the PAC film. Although the resulting external parameters suggest a decrease in the device efficiency from 9...

  15. Preparation and Characterization of Amorphous Silicon Oxide Nanowires

    Institute of Scientific and Technical Information of China (English)

    2007-01-01

    Large-scale amorphous silicon nanowires (SiNWs) with a diameter about 100 nm and a length of dozens of micrometers on silicon wafers were synthesized by thermal evaporation of silicon monoxide (SiO).Scanning electron microscope (SEM) and transmission electron microscope (TEM) observations show that the silicon nanowires are smooth.Selected area electron diffraction (SAED) shows that the silicon nanowires are amorphous and energy-dispersive X-ray spectroscopy (EDS) indicates that the nanowires have the composition of Si and O elements in an atomic ratio of 1:2, their composition approximates that of SiO2.SiO is considered to be used as a Si sources to produce SiNWs.We conclude that the growth mechanism is closely related to the defect structure and silicon monoxide followed by growth through an oxide-assisted vapor-solid reaction.

  16. Electrical characteristics of amorphous iron-tungsten contacts on silicon

    OpenAIRE

    Finetti, M.; Pan, E. T-S.; Suni, I.; Nicolet, M-A.

    1983-01-01

    The electrical characteristics of amorphous Fe-W contacts have been determined on both p-type and n-type silicon. The amorphous films were obtained by cosputtering from a composite target. Contact resistivities, pc=1×10^−7 and pc=2.8×10^−6, were measured on n+ and p+ silicon, respectively. These values remain constant after thermal treatment up to at least 500°C. A barrier height, φBn=0.61 V, was measured on n-type silicon.

  17. Electrical characteristics of amorphous iron-tungsten contacts on silicon

    Science.gov (United States)

    Finetti, M.; Pan, E. T.-S.; Nicolet, M.-A.; Suni, I.

    1983-01-01

    The electrical characteristics of amorphous Fe-W contacts have been determined on both p-type and n-type silicon. The amorphous films were obtained by cosputtering from a composite target. Contact resistivities of 1 x 10 to the -7th and 2.8 x 10 to the -6th were measured on n(+) and p(+) silicon, respectively. These values remain constant after thermal treatment up to at least 500 C. A barrier height of 0.61 V was measured on n-type silicon.

  18. Hydrogenated amorphous silicon deposited by ion-beam sputtering

    Science.gov (United States)

    Lowe, V. E.; Henin, N.; Tu, C.-W.; Tavakolian, H.; Sites, J. R.

    1981-01-01

    Hydrogenated amorphous silicon films 1/2 to 1 micron thick were deposited on metal and glass substrates using ion-beam sputtering techniques. The 800 eV, 2 mA/sq cm beam was a mixture of argon and hydrogen ions. The argon sputtered silicon from a pure (7.6 cm) single crystal wafer, while the hydrogen combined with the sputtered material during the deposition. Hydrogen to argon pressure ratios and substrate temperatures were varied to minimize the defect state density in the amorphous silicon. Characterization was done by electrical resistivity, index of refraction and optical absorption of the films.

  19. Devitrification of rapidly quenched Al–Cu–Ti amorphous alloys

    Indian Academy of Sciences (India)

    D K Misra; R S Tiwari; O N Srivastava

    2003-08-01

    X-ray diffraction, transmission electron microscopy and differential scanning calorimetry were carried out to study the transformation from amorphous to icosahedral/crystalline phases in the rapidly quenched Al50Cu45Ti5 and Al45Cu45Ti10 alloys. In the present investigation, we have studied the formation and stability of amorphous phase in Al50Cu45Ti5 and Al45Cu45Ti10 rapidly quenched alloys. The DSC curve shows a broad complex type of exothermic overlapping peaks (288–550°C) for Al50Cu45Ti5 and a well defined peak around 373°C for Al45Cu45Ti10 alloy. In the case of Al50Cu45Ti5 alloy amorphous to icosahedral phase transformation has been observed after annealing at 280°C for 73 h. Large dendritic growth of icosahedral phase along with -Al phase has been found. Annealing of Al50Cu45Ti5 alloy at 400°C for 8 h results in formation of Al3Ti type phase. Al45Cu45Ti10 amorphous alloy is more stable in comparison to Al50Cu45Ti5 alloy and after annealing at 400°C for 8 h it also transforms to Al3Ti type phase. However, this alloy does not show amorphous to icosahedral phase transformation.

  20. CURRENT PATH IN AMORPHOUS-SILICON FIELD EFFECT TRANSISTORS

    OpenAIRE

    M. MATSUMURA; Kuno, S.; Uchida, Y.

    1981-01-01

    On-resistance of amorphous-silicon field effect transistors with staggered electrodes was investigated. It was found that dependences of the on-resistance on geometrical parameters were classified into two groups. The origin was attributed to the residual resistance between the n+ electrode and the channel which was formed at the silicon-silicon dioxide interface. The resistance was analyzed by taking space charge effect into account, and we found that it changes in accordance with sample pre...

  1. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    OpenAIRE

    Yaser Abdulraheem; Ivan Gordon; Twan Bearda; Hosny Meddeb; Jozef Poortmans

    2014-01-01

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavel...

  2. Enhanced Corrosion Resistance of Iron-Based Amorphous Alloys

    Energy Technology Data Exchange (ETDEWEB)

    Rebak, R B; Day, S D; Lian, T; Aprigliano, L F; Hailey, P D; Farmer, J C

    2007-02-18

    Iron-based amorphous alloys possess enhanced hardness and are highly resistant to corrosion, which make them desirable for wear applications in corrosive environments. It was of interest to examine the behavior of amorphous alloys during anodic polarization in concentrated salt solutions and in the salt-fog testing. Results from the testing of one amorphous material (SAM2X5) both in ribbon form and as an applied coating are reported here. Cyclic polarization tests were performed on SAM2X5 ribbon as well as on other nuclear engineering materials. SAM2X5 showed the highest resistance to localized corrosion in 5 M CaCl{sub 2} solution at 105 C. Salt fog tests of 316L SS and Alloy 22 coupons coated with amorphous SAM2X5 powder showed resistance to rusting. Partial devitrification may be responsible for isolated pinpoint rust spots in some coatings.

  3. Performance of single wire earth return transformers with amorphous alloy core in a rural electric energy distribution system

    Directory of Open Access Journals (Sweden)

    Benedito Antonio Luciano

    2012-10-01

    Full Text Available In this paper are presented some considerations about the performance of single wire earth return amorphous alloy core transformers in comparison with conventional silicon steel sheets cores transformers used in rural electric energy distribution network. It has been recognized that amorphous metal core transformers improve electrical power distribution efficiency by reducing transformer core losses. This reduction is due to some electromagnetic properties of the amorphous alloys such as: high magnetic permeability, high resistivity, and low coercivity. Experimental results obtained with some single-phase, 60 Hz, 5 kVA amorphous core transformers installed in a rural area electric distribution system in Northern Brazil have been confirming their superior performance in comparison to identical nominal rated transformers built with conventional silicon steel cores, particularly with regard to the excitation power and to the no-load losses.

  4. Molecular dynamics study of structural and dynamical properties of amorphous Si-Ge alloys

    International Nuclear Information System (INIS)

    Structural and dynamical properties of amorphous silicon-germanium (a-Si1-xGex) alloys have been examined by molecular dynamics simulations using the Tersoff interatomic potential. Amorphous networks were generated by rapid quenching from liquid Si1-xGex alloys. Good agreement was obtained between the simulated and experimentally measured radial distribution functions and phonon densities of states, suggesting that the Tersoff potential is useful for analyzing the atomic configurations and vibrational properties of a-Si1-xGex alloys. Local atomistic structures, such as topological and chemical short-range order states, were also examined in detail, and we compared them with experimental and theoretical results reported previously. On the basis of the results obtained here, we proposed that the bond length and bond angle around Ge atoms have more distortion than those around Si atoms in a-Si1-xGex networks

  5. Crystalline-Amorphous Core−Shell Silicon Nanowires for High Capacity and High Current Battery Electrodes

    KAUST Repository

    Cui, Li-Feng

    2009-01-14

    Silicon is an attractive alloy-type anode material for lithium ion batteries because of its highest known capacity (4200 mAh/g). However silicon\\'s large volume change upon lithium insertion and extraction, which causes pulverization and capacity fading, has limited its applications. Designing nanoscale hierarchical structures is a novel approach to address the issues associated with the large volume changes. In this letter, we introduce a core-shell design of silicon nanowires for highpower and long-life lithium battery electrodes. Silicon crystalline- amorphous core-shell nanowires were grown directly on stainless steel current collectors by a simple one-step synthesis. Amorphous Si shells instead of crystalline Si cores can be selected to be electrochemically active due to the difference of their lithiation potentials. Therefore, crystalline Si cores function as a stable mechanical support and an efficient electrical conducting pathway while amorphous shells store Li ions. We demonstrate here that these core-shell nanowires have high charge storage capacity (̃1000 mAh/g, 3 times of carbon) with ̃90% capacity retention over 100 cycles. They also show excellent electrochemical performance at high rate charging and discharging (6.8 A/g, ̃20 times of carbon at 1 h rate). © 2009 American Chemical Society.

  6. Influence of microstructure and hydrogen concentration on amorphous silicon crystallization

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon samples were deposited on glass substrates at different temperatures by high frequency plasma-enhanced chemical vapor deposition. In this way, samples with different hydrogen concentrations and structures were obtained. The transition from an amorphous to a crystalline material, induced by a four-step thermal annealing sequence, has been followed. Effusion of hydrogen from the films plays an important role in the nucleation and growth mechanisms of crystalline silicon grains. Measurements of hydrogen concentrations, Raman scattering, X-ray diffraction and UV reflectance showed that an enhanced crystallization was obtained on samples deposited at lower substrate temperatures. A correlation between these measurements allows to analyze the evolution of structural properties of the samples. The presence of voids in the material, related to disorder in the amorphous matrix, results in a better quality of the resulting nanocrystalline silicon thin films.

  7. Influence of microstructure and hydrogen concentration on amorphous silicon crystallization

    Energy Technology Data Exchange (ETDEWEB)

    Budini, N., E-mail: nbudini@intec.unl.edu.a [Instituto de Desarrollo Tecnologico para la Industria Quimica, UNL-CONICET, Gueemes 3450, S3000GLN Santa Fe (Argentina); Rinaldi, P.A. [Instituto de Desarrollo Tecnologico para la Industria Quimica, UNL-CONICET, Gueemes 3450, S3000GLN Santa Fe (Argentina); Schmidt, J.A.; Arce, R.D.; Buitrago, R.H. [Instituto de Desarrollo Tecnologico para la Industria Quimica, UNL-CONICET, Gueemes 3450, S3000GLN Santa Fe (Argentina); Facultad de Ingenieria Quimica, UNL, Santiago del Estero 2829, S3000AOM Santa Fe (Argentina)

    2010-07-01

    Hydrogenated amorphous silicon samples were deposited on glass substrates at different temperatures by high frequency plasma-enhanced chemical vapor deposition. In this way, samples with different hydrogen concentrations and structures were obtained. The transition from an amorphous to a crystalline material, induced by a four-step thermal annealing sequence, has been followed. Effusion of hydrogen from the films plays an important role in the nucleation and growth mechanisms of crystalline silicon grains. Measurements of hydrogen concentrations, Raman scattering, X-ray diffraction and UV reflectance showed that an enhanced crystallization was obtained on samples deposited at lower substrate temperatures. A correlation between these measurements allows to analyze the evolution of structural properties of the samples. The presence of voids in the material, related to disorder in the amorphous matrix, results in a better quality of the resulting nanocrystalline silicon thin films.

  8. GHz-rate optical parametric amplifier in hydrogenated amorphous silicon

    International Nuclear Information System (INIS)

    We demonstrate optical parametric amplification operating at GHz-rates at telecommunications wavelengths using a hydrogenated amorphous silicon waveguide through the nonlinear optical process of four-wave mixing. We investigate how the parametric amplification scales with repetition rate. The ability to achieve amplification at GHz-repetition rates shows hydrogenated amorphous silicon’s potential for telecommunication applications and a GHz-rate optical parametric oscillator. (paper)

  9. Grain boundary resistance to amorphization of nanocrystalline silicon carbide

    OpenAIRE

    Dong Chen; Fei Gao; Bo Liu

    2015-01-01

    Under the C displacement condition, we have used molecular dynamics simulation to examine the effects of grain boundaries (GBs) on the amorphization of nanocrystalline silicon carbide (nc-SiC) by point defect accumulation. The results show that the interstitials are preferentially absorbed and accumulated at GBs that provide the sinks for defect annihilation at low doses, but also driving force to initiate amorphization in the nc-SiC at higher doses. The majority of surviving defects are C in...

  10. Features of exoelectron emission in amorphous metallic alloys

    CERN Document Server

    Veksler, A S; Morozov, I L; Semenov, A L

    2001-01-01

    The peculiarities of the photothermostimulated exoelectron emission in amorphous metallic alloys of the Fe sub 6 sub 4 Co sub 2 sub 1 B sub 1 sub 5 composition are studied. It is established that the temperature dependences of the exoelectron emission spectrum adequately reflect the two-stage character of the amorphous alloy transition into the crystalline state. The exoelectron emission spectrum is sensitive to the variations in the modes of the studied sample thermal treatment. The thermal treatment of the amorphous metallic alloy leads to growth in the intensity of the exoelectrons yield. The highest growth in the intensify of the exoelectron emission was observed in the alloys at the initial stage of their crystallization

  11. Modelling structure and properties of amorphous silicon boron nitride ceramics

    OpenAIRE

    Johann Christian Schön; Alexander Hannemann; Guneet Sethi; Ilya Vladimirovich Pentin; Martin Jansen

    2011-01-01

    Silicon boron nitride is the parent compound of a new class of high-temperature stable amorphous ceramics constituted of silicon, boron, nitrogen, and carbon, featuring a set of properties that is without precedent, and represents a prototypical random network based on chemical bonds of predominantly covalent character. In contrast to many other amorphous materials of technological interest, a-Si3B3N7 is not produced via glass formation, i.e. by quenching from a melt, the reason being that th...

  12. Mechanism of Germanium-Induced Perimeter Crystallization of Amorphous Silicon

    OpenAIRE

    Hakim, M. M. A.; Ashburn, P.

    2007-01-01

    We report a study aimed at highlighting the mechanism of a new amorphous silicon crystallization phenomenon that originates from the perimeter of a germanium layer during low-temperature annealing (500°C). Results are reported on doped and undoped amorphous silicon films, with thicknesses in the range 40–200 nm, annealed at a temperature of 500 or 550°C. A comparison is made of crystallization arising from Ge and SiGe layers and the role of damage from a high-dose fluorine implant is investig...

  13. Potential of amorphous and microcrystalline silicon solar cells

    OpenAIRE

    Meier, Johannes; Spitznagel, J.; Kroll, U.; Bucher, C.; Faÿ Sylvie; Moriarty, T.; Shah, Arvind

    2008-01-01

    Low pressure chemical vapour deposition (LP-CVD) ZnO as front transparent conductive oxide (TCO), developed at IMT, has excellent light-trapping properties for a-Si:H p-i-n single-junction and ‘micromorph’ (amorphous/microcrystalline silicon) tandem solar cells. A stabilized record efficiency of 9.47% has independently been confirmed by NREL for an amorphous silicon single-junction p-i-n cell (~1 cm2) deposited on LP-CVD ZnO coated glass. Micromorph tandem cells with an initial efficiency of ...

  14. Surface orientation effects in crystalline-amorphous silicon interfaces

    OpenAIRE

    Nolan, Michael; Legesse, Merid; Fagas, Giorgos

    2012-01-01

    In this paper we present the results of empirical potential and density functional theory (DFT) studies of models of interfaces between amorphous silicon (a-Si) or hydrogenated amorphous Si (a-Si:H) and crystalline Si (c-Si) on three unreconstructed silicon surfaces, namely (100), (110) and (111). In preparing models of a-Si on c-Si, melting simulations are run with classical molecular dynamics (MD) at 3000 K for 10 ps to melt part of the crystalline surface and the structure is quenched to 3...

  15. Optical contrast in ion-implanted amorphous silicon carbide nanostructures

    International Nuclear Information System (INIS)

    Topographic and optical contrasts formed by Ga+ ion irradiation of thin films of amorphous silicon carbide have been investigated with scanning near-field optical microscopy. The influence of ion-irradiation dose has been studied in a pattern of sub-micrometre stripes. While the film thickness decreases monotonically with ion dose, the optical contrast rapidly increases to a maximum value and then decreases gradually. The results are discussed in terms of the competition between the effects of ion implantation and surface milling by the ion beam. The observed effects are important for uses of amorphous silicon carbide thin films as permanent archives in optical data storage applications

  16. Adjustable ultraviolet sensitive detectors based on amorphous silicon

    OpenAIRE

    TOPIC, M; Stiebig, H.; Krause, M.; Wagner, H.

    2001-01-01

    Thin-film detectors made of hydrogenated amorphous silicon (LI-Si:H) and amorphous silicon carbide (a-SiC:H) with adjustable sensitivity in the ultraviolet (UV) spectrum were developed. Thin PIN diodes deposited on glass substrates in N-I-P layer sequence with a total thickness of down to 33 nm and a semitransparent Ag front contact were fabricated. The optimized diodes with a 10 nm Ag contact exhibit spectral response values above 80 mA/W in the wavelength range from 295 to 395 nm with a max...

  17. Amorphous Silicon Carbide for Photovoltaic Applications

    OpenAIRE

    JANZ, Stefan

    2006-01-01

    Within this work amorphous SiC is investigated for its applicability in photovoltaic devices. The temperature stability and dopability of SiC makes this material very attractive for applications in this area. Physical basics of amorphous SiC networks and plasma processes are discussed and first measurements with FTIR of the different layer types show the complexity of the network. The special features of the plasma reactor such as high temperature deposition and two-source excitation are also...

  18. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    International Nuclear Information System (INIS)

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of Si-Si bonds are concluded for the pyrolysis temperature Tp = 270 to 360 °C. The appearance of amorphous silicon phonon bands in Raman spectra for films prepared at Tp ≥ 330 °C suggests the construction of a three-dimensional amorphous silicon network. Films prepared at Tp ≥ 360 °C exhibit a hydrogen content near 10 at.% and an optical gap near 1.6 eV similar to device-grade vacuum processed a-Si:H. However, the infrared microstructure factor, the spin density, and the photosensitivity require significant improvements. - Highlights: ► We fabricate hydrogenated amorphous silicon (a-Si:H) films by a solution process. ► The a-Si:H films are prepared by pyrolytic transformation in polysilane solution. ► We investigate basic properties in relation to the pyrolysis temperature. ► Raman spectra, hydrogen content, and optical gap are similar to device-grade a-Si:H. ► Microstructure factor, spin density, and photoconductivity show poor quality.

  19. Advances in chemical synthesis and application of metal-metalloid amorphous alloy nanoparticulate catalysts

    Institute of Scientific and Technical Information of China (English)

    WU Zhijie; LI Wei; ZHANG Minghui; TAO Keyi

    2007-01-01

    This paper reviews the advances in the chemical synthesis and application of metal-metalloid amorphous alloy nanoparticles consisting of transition metal (M) and metalloid elements (B,P).After a brief introduction on the history of amorphous alloy catalysts,the paper focuses on the properties and characterization of amorphous alloy catalysts,and recent developments in the solution-phase synthesis of amorphous alloy nanoparticles.This paper further outlines the applications of amorphous alloys,with special emphasis on the problems and strategies for the application of amorphous alloy nanoparticles in catalytic reactions.

  20. Amorphous Hydrogenated Carbon-Nitrogen Alloy Thin Films for Solar Cell Application

    Institute of Scientific and Technical Information of China (English)

    ZHOU Zhi-Bin; DING Zheng-Ming; PANG Qian-Jun; CUI Rong-Qiang

    2001-01-01

    Amorphous hydrogenated carbon-nitrogen alloy (a-CNx :H) thin films have been deposited on silicon substratesby improved dc magnetron sputtering from a graphite target in nitrogen and hydrogen gas discharging. Thefilms are investigated by using Raman spectroscopy, x-ray photoelectron spectroscopy, spectral ellipsometer and electron spin resonance techniques. The optimized process condition for solar cell application is discussed. Thephotovoltaic property of a-CNx:H/silicon heterojunctions can be improved by the adjustment of the pressureratio of hydrogen to nitrogen and unbalanced magnetic field intensity. Open-circuit voltage and short-circuitcurrent reach 300mV and 5.52 Ma/cm2, respectively.

  1. Polarization and resistivity measurements of post-crystallization changes in amorphous Fe-B-Si alloys

    International Nuclear Information System (INIS)

    The effects of grain growth and compositional changes on the electrochemical behavior and the resistivity of amorphous iron-boron-silicon (Fe77.5B15Si7.5) alloys after crystallization were studied. Deterioration of the protective passive film was observed, along with increased annealing. Potentiodynamic polarization provided excellent information about microstructural and chemical changes. It was concluded that electrochemical measurements could be used in conjunction with resistivity measurements in direct studies of grain growth and chemical changes occurring in different phases of the devitrified alloy

  2. Growth mechanisms and characterization of hydrogenated amorphous-silicon-alloy films. Final subcontract report, 15 February 1991--14 April 1994

    Energy Technology Data Exchange (ETDEWEB)

    Gallagher, A.; Tanenbaum, D.; Laracuente, A.; Kalra, P. [National Inst. of Standards and Technology, Boulder, CO (United States)

    1994-07-01

    This report describes work performed to better understand the atomic-scale structure of glow-discharge-produced a-Si:H, a-Ge:H, and a-Si:Ge:H films; its effect on film quality; and its dependence on deposition discharge conditions. Hydrogenated a-Si films are from a silane rf discharge onto atomically flat crystal Si and GaAs substrates. The substrates are then transferred in a scanning tunneling microscope, where the atomic-scale surface morphology is measured. The films were deposited using device-quality deposition conditions; IR absorption, {sigma}{sub L}, and {sigma}{sub D} indicate high-quality intrinsic films. From the thickness dependence of the surface morphology, we determined that the films initially conform smoothly to an atomically flat Si or GaAs substrate, but as the thickness increases the roughness steadily increases to approximately 10% of the length of the scanned region. The surface of 100--400-nm-thick films is highly inhomogeneous, with steep hills and canyons in some areas and large atomically smooth regions in others. These unexpectedly large surface irregularities indicate severe and often connected void structures in the growing film, as well as relatively limited-range surface diffusion of the incorporating SiH{sub 3} radicals. On the other hand, large atomically flat surface were occasionally found, indicating the possibility of growing a homogeneous and compact amorphous film if appropriate growth conditions could be discovered.

  3. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    OpenAIRE

    Masuda, Takashi; Matsuki, Yasuo; Shimoda, Tatsuya

    2012-01-01

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of S...

  4. Temperature dependence of hydrogenated amorphous silicon solar cell performances

    OpenAIRE

    Riesen, Y.; Stuckelberger, M.; Haug, F. -J.; Ballif, C.; N. Wyrsch

    2016-01-01

    Thin-film hydrogenated amorphous silicon solar (a-Si:H) cells are known to have better temperature coefficients than crystalline silicon cells. To investigate whether a-Si:H cells that are optimized for standard conditions (STC) also have the highest energy yield, we measured the temperature and irradiance dependence of the maximum power output (Pmpp), the fill factor (FF), the short-circuit current density (Jsc), and the open-circuit voltage (Voc) for four series of cells fabricated with dif...

  5. Amorphous silicon research. Final technical report, 13 September 1994--28 February 1998

    Energy Technology Data Exchange (ETDEWEB)

    Arya, R.; Carlson, D.; Chen, L.; Ganguly, G.; He, M.; Lin, G.; Middya, R.; Skibo, S.; Wood, G. [Solarex, Newtown, PA (United States)

    1998-06-01

    The Solarex research and development program has focused for the last few years on developing a high-performance amorphous silicon tandem process and on scaling it up to large areas. Significant progress has been made in several areas: (1) improved understanding of the light-induced degradation of amorphous silicon alloys, (2) the processing time for tandem device structures has been reduced by 21%, (3) the feedstock gas utilization has been increased by 30%, (4) stabilized conversion efficiencies of more than 8% have been demonstrated in 4-ft{sup 2} tandem modules made in a pilot production mode, and (4) the tandem module process has been transferred to a Solarex manufacturing plant in Virginia that is capable of producing 10 MW of 8.6-ft{sup 2} tandem modules per year.

  6. Amorphous Alloy Membranes for High Temperature Hydrogen Separation

    Energy Technology Data Exchange (ETDEWEB)

    Coulter, K

    2013-09-30

    At the beginning of this project, thin film amorphous alloy membranes were considered a nascent but promising new technology for industrial-scale hydrogen gas separations from coal- derived syngas. This project used a combination of theoretical modeling, advanced physical vapor deposition fabricating, and laboratory and gasifier testing to develop amorphous alloy membranes that had the potential to meet Department of Energy (DOE) targets in the testing strategies outlined in the NETL Membrane Test Protocol. The project is complete with Southwest Research Institute® (SwRI®), Georgia Institute of Technology (GT), and Western Research Institute (WRI) having all operated independently and concurrently. GT studied the hydrogen transport properties of several amorphous alloys and found that ZrCu and ZrCuTi were the most promising candidates. GT also evaluated the hydrogen transport properties of V, Nb and Ta membranes coated with different transition-metal carbides (TMCs) (TM = Ti, Hf, Zr) catalytic layers by employing first-principles calculations together with statistical mechanics methods and determined that TiC was the most promising material to provide catalytic hydrogen dissociation. SwRI developed magnetron coating techniques to deposit a range of amorphous alloys onto both porous discs and tubular substrates. Unfortunately none of the amorphous alloys could be deposited without pinhole defects that undermined the selectivity of the membranes. WRI tested the thermal properties of the ZrCu and ZrNi alloys and found that under reducing environments the upper temperature limit of operation without recrystallization is ~250 °C. There were four publications generated from this project with two additional manuscripts in progress and six presentations were made at national and international technical conferences. The combination of the pinhole defects and the lack of high temperature stability make the theoretically identified most promising candidate amorphous alloys

  7. Bi-SERS sensing and enhancement by Au-Ag bimetallic non-alloyed nanoparticles on amorphous and crystalline silicon substrate.

    Science.gov (United States)

    Tan, Chee Leong; Lee, Soo Kyung; Lee, Yong Tak

    2015-03-01

    We have demonstrated Au-Ag bimetallic non-alloy nanoparticles (BNNPs) on thin a-Si film and c-Si substrate for high SERS enhancement, low cost, high sensitivity and reproducible SERS substrate with bi-SERS sensing properties where two different SERS peak for Au NPs and Ag NPs are observed on single SERS substrate. The isolated Au-Ag bimetallic NPs, with uniform size and spacing distribution, are suitable for uniform high density hotspot SERS enhancement. The SERS enhancement factor of Au-Ag BNNPs is 2.9 times higher compared to Ag NPs on similar substrates due to the increase of the localized surface plasmon resonance effect. However there is a decrement of SERS peak intensity at specific wavenumbers when the surrounding refractive index increases due to out-phase hybridization of Au NPs. The distinct changes of the two different SERS peaks on single Au-Ag BNNPs SERS substrate due to Au and Ag NPs independently show possible application for bi-molecular sensing. PMID:25836846

  8. Nanoindentation-induced amorphization in silicon carbide

    Science.gov (United States)

    Szlufarska, Izabela; Kalia, Rajiv K.; Nakano, Aiichiro; Vashishta, Priya

    2004-07-01

    The nanoindentation-induced amorphization in SiC is studied using molecular dynamics simulations. The load-displacement response shows an elastic shoulder followed by a plastic regime consisting of a series of load drops. Analyses of bond angles, local pressure, and shear stress, and shortest-path rings show that these drops are related to dislocation activities under the indenter. We show that amorphization is driven by coalescence of dislocation loops and that there is a strong correlation between load-displacement response and ring distribution.

  9. First-principles study of hydrogenated amorphous silicon

    NARCIS (Netherlands)

    Jarolimek, K.; Groot, R.A. de; Wijs, G.A. de; Zeman, M.

    2009-01-01

    We use a molecular-dynamics simulation within density-functional theory to prepare realistic structures of hydrogenated amorphous silicon. The procedure consists of heating a crystalline structure of Si64H8 to 2370 K, creating a liquid and subsequently cooling it down to room temperature. The effect

  10. Photocurrent images of amorphous-silicon solar-cell modules

    Science.gov (United States)

    Kim, Q.; Shumka, A.; Trask, J.

    1985-01-01

    Results obtained in applying the unique characteristics of the solar cell laser scanner to investigate the defects and quality of amorphous silicon cells are presented. It is concluded that solar cell laser scanners can be effectively used to nondestructively test not only active defects but also the cell quality and integrity of electrical contacts.

  11. Long-term stability of amorphous-silicon modules

    Science.gov (United States)

    Ross, R. G., Jr.

    1986-01-01

    The Jet Propulsion Laboratory (JPL) program of developing qualification tests necessary for amorphous silicon modules, including appropriate accelerated environmental tests reveal degradation due to illumination. Data were given which showed the results of temperature-controlled field tests and accelerated tests in an environmental chamber.

  12. Atomistic models of hydrogenated amorphous silicon nitride from first principles

    NARCIS (Netherlands)

    Jarolimek, K.; De Groot, R.A.; De Wijs, G.A.; Zeman, M.

    2010-01-01

    We present a theoretical study of hydrogenated amorphous silicon nitride (a-SiNx:H), with equal concentrations of Si and N atoms (x=1), for two considerably different densities (2.0 and 3.0 g/cm3). Densities and hydrogen concentration were chosen according to experimental data. Using first-principle

  13. Atomistic models of hydrogenated amorphous silicon nitride from first principles

    NARCIS (Netherlands)

    Jarolimek, K.; Groot, R.A. de; Wijs, G.A. de; Zeman, M.

    2010-01-01

    We present a theoretical study of hydrogenated amorphous silicon nitride (a-SiNx:H), with equal concentrations of Si and N atoms (x=1), for two considerably different densities (2.0 and 3.0 g/cm3). Densities and hydrogen concentration were chosen according to experimental data. Using first-principle

  14. A new tevchnique for production of amorphous silicon solar cells

    International Nuclear Information System (INIS)

    It is presented a new technique for the production of amorphous silicon solar cells based on the development of thin films of a-Si in a reactor in which the decomposition of the sylane, induced by capacitively coupled RF, and the film deposition occur in separate chambers. (M.W.O.)

  15. Amorphous silicon carbide coatings for extreme ultraviolet optics

    Science.gov (United States)

    Kortright, J. B.; Windt, David L.

    1988-01-01

    Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.

  16. Ion-assisted recrystallization of amorphous silicon

    Science.gov (United States)

    Priolo, F.; Spinella, C.; La Ferla, A.; Rimini, E.; Ferla, G.

    1989-12-01

    Our recent work on ion-beam-assisted epitaxial growth of amorphous Si layers on single crystal substrates is reviewed. The planar motion of the crystal-amorphous interface was monitored in situ, during irradiations, by transient reflectivity measurements. This technique allows the measurement of the ion-induced growth rate with a very high precision. We have observed that this growth rate scales linearly with the number of displacements produced at the crystal-amorphous interface by the impinging ions. Moreover the regrowth onto oriented substrates is a factor of ≈ 4 faster with respect to that on substrates. Impurities dissolved in the amorphous layer influence the kinetics of recrystallization. For instance, dopants such as As, B and P enhance the ion-induced growth rate while oxygen has the opposite effect. The dependence of the rate on impurity concentration is however less strong with respect to pure thermal annealing. For instance, an oxygen concentration of 1 × 1021 / cm3 decreases the ion-induced growth rate by a factor of ≈ 3; this same concentration would have decreased the rate of pure thermal annealing by more than 4 orders of magnitude. The reduced effects of oxygen during ion-beam crystallization allow the regrowth of deposited Si layers despite the presence of a high interfacial oxygen content. The process is investigated in detail and its possible application to the microelectronic technology is discussed.

  17. New technological method of forming an ohmic contact to undoped amorphous silicon hydride semiconductors

    International Nuclear Information System (INIS)

    . This brings about increase of the conditions density, localized in energy gap of the amorphous semiconductor nearby Fermi level g(EF) or with reduction a content of the hydrogen in a-Si:H alloy, the space-charge region with occurs the reduction, and as result the efficient height of metal - a-Si:H barriers deceases. Consequently, the annealing process provides a highly defective un hydrogenated region through which carriers can easily tunnel. This effect is identified as over barrier emission at decrease of the efficient height of the potential barrier between metal and semiconductor on voltage current characteristic. Thus, this method provides for forming stable ohmic contact between, for example, a metal and amorphous silicon hydride which doesn't require a heavily doped N+ layer

  18. Raman and ellipsometric characterization of hydrogenated amorphous silicon thin films

    Institute of Scientific and Technical Information of China (English)

    2009-01-01

    Hydrogenated amorphous silicon (a-Si:H) thin films were deposited by plasma-enhanced vapor deposition (PECVD) at different silane temperatures (Tg) before glow-discharge. The effect of Tg on the amorphous network and optoelectronic properties of the films has been investigated by Raman scattering spectra, ellipsometric transmittance spectra, and dark conductivity measurement, respectively. The results show that the increase in Tg leads to an improved ordering of amorphous network on the short and intermediate scales and an increase of both refractive index and absorption coefficient in a-Si:H thin films. It is indicated that the dark conductivity increases by two orders of magnitude when Tg is raised from room temperature (RT) to 433 K. The continuous ordering of amorphous network of a-Si:H thin films deposited at a higher Tg is the main cause for the increase of dark conductivity.

  19. Raman and ellipsometric characterization of hydrogenated amorphous silicon thin films

    Institute of Scientific and Technical Information of China (English)

    LIAO NaiMan; LI Wei; KUANG YueJun; JIANG YaDong; LI ShiBin; WU ZhiMing; QI KangCheng

    2009-01-01

    Hydrogenated amorphous silicon (a-Si:H) thin films were deposited by plasma-enhanced vapor depo-sition (PEOVD) at different silane temperatures (Tg) before glow-discharge. The effect of Tg on the amorphous network and optoelectronic properties of the films has been investigated by Raman scat-tering spectra, ellipsometric transmittance spectra, and dark conductivity measurement, respectively. The results show that the increase in Tg leads to an improved ordering of amorphous network on the short and intermediate scales and an increase of both refractive index and absorption coefficient in a-Si:H thin films. It is indicated that the dark conductivity increases by two orders of magnitude when Tg is raised from room temperature (RT) to 433 K. The continuous ordering of amorphous network of a-Si:H thin films deposited at a higher Tg is the main cause for the increase of dark conductivity.

  20. Hydrogen-free amorphous silicon with no tunneling states.

    Science.gov (United States)

    Liu, Xiao; Queen, Daniel R; Metcalf, Thomas H; Karel, Julie E; Hellman, Frances

    2014-07-11

    The ubiquitous low-energy excitations, known as two-level tunneling systems (TLSs), are one of the universal phenomena of amorphous solids. Low temperature elastic measurements show that e-beam amorphous silicon (a-Si) contains a variable density of TLSs which diminishes as the growth temperature reaches 400 °C. Structural analyses show that these a-Si films become denser and more structurally ordered. We conclude that the enhanced surface energetics at a high growth temperature improved the amorphous structural network of e-beam a-Si and removed TLSs. This work obviates the role hydrogen was previously thought to play in removing TLSs in the hydrogenated form of a-Si and suggests it is possible to prepare "perfect" amorphous solids with "crystal-like" properties for applications. PMID:25062205

  1. Amorphous silicon rich silicon nitride optical waveguides for high density integrated optics

    DEFF Research Database (Denmark)

    Philipp, Hugh T.; Andersen, Karin Nordström; Svendsen, Winnie Edith;

    2004-01-01

    Amorphous silicon rich silicon nitride optical waveguides clad in silica are presented as a high-index contrast platform for high density integrated optics. Performance of different cross-sectional geometries have been measured and are presented with regards to bending loss and insertion loss. A...

  2. Heat-Induced Agglomeration of Amorphous Silicon Nanoparticles Toward the Formation of Silicon Thin Film.

    Science.gov (United States)

    Jang, Bo Yun; Kim, Ja Young; Seo, Gyeongju; Shin, Chae-Ho; Ko, Chang Hyun

    2016-01-01

    The thermal behavior of silicon nanoparticles (Si NPs) was investigated for the preparation of silicon thin film using a solution process. TEM analysis of Si NPs, synthesized by inductively coupled plasma, revealed that the micro-structure of the Si NPs was amorphous and that the Si NPs had melted and merged at a comparatively low temperature (~750 °C) considering bulk melting temperature of silicon (1414 °C). A silicon ink solution was prepared by dispersing amorphous Si NPs in propylene glycol (PG). It was then coated onto a silicon wafer and a quartz plate to form a thin film. These films were annealed in a vacuum or in an N₂ environment to increase their film density. N2 annealing at 800 °C and 1000 °C induced the crystallization of the amorphous thin film. An elemental analysis by the SIMS depth profile showed that N₂annealing at 1000 °C for 180 min drastically reduced the concentrations of carbon and oxygen inside the silicon thin film. These results indicate that silicon ink prepared using amorphous Si NPs in PG can serve as a proper means of preparing silicon thin film via solution process. PMID:27398566

  3. High quality crystalline silicon surface passivation by combined intrinsic and n-type hydrogenated amorphous silicon

    NARCIS (Netherlands)

    Schuttauf, J.A.; van der Werf, C.H.M.; Kielen, I.M.; van Sark, W.G.J.H.M.; Rath, J.K.

    2011-01-01

    We investigate the influence of thermal annealing on the passivation quality of crystalline silicon (c-Si) surfaces by intrinsic and n-type hydrogenated amorphous silicon (a-Si:H) films. For temperatures up to 255 C, we find an increase in surface passivation quality, corresponding to a decreased da

  4. Role of amorphous silicon domains on Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide film

    Institute of Scientific and Technical Information of China (English)

    陈长勇; 陈维德; 李国华; 宋淑芳; 丁琨; 许振嘉

    2003-01-01

    An investigation on the correlation between amorphous Si (a-Si) domains and Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide (a-Si:O:H) film is presented. On one hand, a-Si domains provide sufficient carriers for Er3+ carrier-mediated excitation which has been proved to be the highest excitation path for Er3+ ion; on the other hand, hydrogen diffusion from a-Si domains to amorphous silicon oxide (a-SiOx) matrix during annealing has been found and this possibly decreases the number of nonradiative centres around Er3+ ions. This study provides a better understanding of the role of a-Si domains on Er3+ emission in a-Si:O:Hfilms.

  5. Role of amorphous silicon domains of Er3+ emission in the Er—doped hydrogenated amorphous silicon suboxide film

    Institute of Scientific and Technical Information of China (English)

    ChenChang-Yong; ChenWei-De; LeGuo-Hua; SongShu-Fang; DingKun; XuZhen-Jia

    2003-01-01

    An investigation on the correlation between amorphous Si(a-Si) domains and Er3+ emission in the Er-doped hydrogenated amorphous silicon suboxide (a-Si:O:H) film is presented. On one hand, a-Si domains provide sufficient carrlers for Er3+ carrier-mediated excitation which has been proved to be the highest excitation path for Er3+ ion; on the other hand, hydrogen diffusion from a-Si domains to amorphous silicon oxide (a-SiOx) matrix during annealing has been found and this possibly decreases the number of nonradiative centres around Er3+ ions. This study provides a better understanding of the role of a-Si domains on Er3+ emission in a-Si:O:H films.

  6. Multi-band silicon quantum dots embedded in an amorphous matrix of silicon carbide.

    Science.gov (United States)

    Chang, Geng-rong; Ma, Fei; Ma, Da-yan; Xu, Ke-wei

    2010-11-19

    Silicon quantum dots embedded in an amorphous matrix of silicon carbide were realized by a magnetron co-sputtering process and post-annealing. X-ray photoelectron spectroscopy, glancing x-ray diffraction, Raman spectroscopy and high-resolution transmission electron microscopy were used to characterize the chemical composition and the microstructural properties. The results show that the sizes and size distribution of silicon quantum dots can be tuned by changing the annealing atmosphere and the atom ratio of silicon and carbon in the matrix. A physicochemical mechanism is proposed to demonstrate this formation process. Photoluminescence measurements indicate a multi-band configuration due to the quantum confinement effect of silicon quantum dots with different sizes. The PL spectra are further widened as a result of the existence of amorphous silicon quantum dots. This multi-band configuration would be extremely advantageous in improving the photoelectric conversion efficiency of photovoltaic solar cells. PMID:20975214

  7. Multi-band silicon quantum dots embedded in an amorphous matrix of silicon carbide

    International Nuclear Information System (INIS)

    Silicon quantum dots embedded in an amorphous matrix of silicon carbide were realized by a magnetron co-sputtering process and post-annealing. X-ray photoelectron spectroscopy, glancing x-ray diffraction, Raman spectroscopy and high-resolution transmission electron microscopy were used to characterize the chemical composition and the microstructural properties. The results show that the sizes and size distribution of silicon quantum dots can be tuned by changing the annealing atmosphere and the atom ratio of silicon and carbon in the matrix. A physicochemical mechanism is proposed to demonstrate this formation process. Photoluminescence measurements indicate a multi-band configuration due to the quantum confinement effect of silicon quantum dots with different sizes. The PL spectra are further widened as a result of the existence of amorphous silicon quantum dots. This multi-band configuration would be extremely advantageous in improving the photoelectric conversion efficiency of photovoltaic solar cells.

  8. Properties of hydrogenated amorphous silicon (a-Si:H) deposited using a microwave Ecr plasma

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon (a-Si:H) films have been widely applied to semiconductor devices, such as thin film transistors, solar cells and photosensitive devices. In this work, the first Si-H-Cl alloys (obtained at the National Institute for Nuclear Research of Mexico) were formed by a microwave electron cyclotron resonance (Ecr) plasma CVD method. Gaseous mixtures of silicon tetrachloride (Si Cl4), hydrogen and argon were used. The Ecr plasma was generated by microwaves at 2.45 GHz and a magnetic field of 670 G was applied to maintain the discharge after resonance condition (occurring at 875 G). Si and Cl contents were analyzed by Rutherford Backscattering Spectrometry (RBS). It was found that, increasing proportion of Si Cl4 in the mixture or decreasing pressure, the silicon and chlorine percentages decrease. Optical gaps were obtained by spectrophotometry. Decreasing temperature, optical gap values increase from 1.4 to 1.5 eV. (Author)

  9. Electrical Characterization of Amorphous Silicon Nitride Passivation Layers for Crystalline Silicon Solar Cells

    OpenAIRE

    Helland, Susanne

    2011-01-01

    High quality surface passivation is important for the reduction of recombination losses in solar cells. In this work, the passivation properties of amorphous hydrogenated silicon nitride for crystalline silicon solar cells were investigated, using electrical characterization, lifetime measurements and spectroscopic ellipsometry. Thin films of varying composition were deposited on p-type monocrystalline silicon wafers by plasma enhanced chemical vapor deposition (PECVD). Highest quality surfac...

  10. Kirchhoff?s generalised law applied to amorphous silicon / crystalline silicon heterostructures

    OpenAIRE

    Brüggemann, Rudolf

    2009-01-01

    Abstract The electro- and photoluminescence spectra of amorphous silicon / crystalline silicon heterostructures and solar cells are determined by emission from the crystalline-silicon layer and are computed with Kirchhoff?s generalised law. The interface defect density strongly influences the luminescence yield which may be used to monitor the interface quality. Based on a comparison between numerical and analytically determined spectra, the temperature dependence of experimental e...

  11. Room temperature visible photoluminescence of silicon nanocrystallites embedded in amorphous silicon carbide matrix

    International Nuclear Information System (INIS)

    The nanocrystalline silicon embedded in amorphous silicon carbide matrix was prepared by varying rf power in high vacuum plasma enhanced chemical vapor deposition system using silane methane gas mixture highly diluted in hydrogen. In this paper, we have studied the evolution of the structural, optical, and electrical properties of this material as a function of rf power. We have observed visible photoluminescence at room temperature and also have discussed the role played by the Si nanocrystallites and the amorphous silicon carbide matrix. The decrease of the nanocrystalline size, responsible for quantum confinement effect, facilitated by the amorphous silicon carbide matrix, is shown to be the primary cause for the increase in the PL intensity, blueshift of the PL peak position, decrease of the PL width (full width at half maximum) as well as the increase of the optical band gap and the decrease of the dark conductivity

  12. Plasma Deposition of Doped Amorphous Silicon

    Science.gov (United States)

    Calcote, H. F.

    1985-01-01

    Pair of reports present further experimental details of investigation of plasma deposition of films of phosphorous-doped amosphous silicon. Probe measurements of electrical resistance of deposited films indicated films not uniform. In general, it appeared that resistance decreased with film thickness.

  13. Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film

    Energy Technology Data Exchange (ETDEWEB)

    Masuda, Takashi, E-mail: mtakashi@jaist.ac.jp [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); Matsuki, Yasuo [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); Yokkaichi Research Center, JSR Corporation, 100 Kawajiri-cho, Yokkaichi, Mie, 510-8552 (Japan); Shimoda, Tatsuya [Japan Science and Technology Agency, ERATO, Shimoda Nano-Liquid Process Project, 2-13 Asahidai, Nomi, Ishikawa, 923-1211 (Japan); School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa, 923-1292 (Japan)

    2012-08-31

    The fabrication of thin film silicon devices based on solution processes rather than on conventional vacuum processes is of substantial interest since cost reductions may result. Using a solution process, we coated substrates with polydihydrosilane solution and studied the pyrolytic transformation of the material into hydrogenated amorphous silicon (a-Si:H). From thermal gravimetry and differential thermal analysis data a significant reduction in weight of the material and a construction of Si-Si bonds are concluded for the pyrolysis temperature T{sub p} = 270 to 360 Degree-Sign C. The appearance of amorphous silicon phonon bands in Raman spectra for films prepared at T{sub p} {>=} 330 Degree-Sign C suggests the construction of a three-dimensional amorphous silicon network. Films prepared at T{sub p} {>=} 360 Degree-Sign C exhibit a hydrogen content near 10 at.% and an optical gap near 1.6 eV similar to device-grade vacuum processed a-Si:H. However, the infrared microstructure factor, the spin density, and the photosensitivity require significant improvements. - Highlights: Black-Right-Pointing-Pointer We fabricate hydrogenated amorphous silicon (a-Si:H) films by a solution process. Black-Right-Pointing-Pointer The a-Si:H films are prepared by pyrolytic transformation in polysilane solution. Black-Right-Pointing-Pointer We investigate basic properties in relation to the pyrolysis temperature. Black-Right-Pointing-Pointer Raman spectra, hydrogen content, and optical gap are similar to device-grade a-Si:H. Black-Right-Pointing-Pointer Microstructure factor, spin density, and photoconductivity show poor quality.

  14. On the Effect of the Amorphous Silicon Microstructure on the Grain Size of Solid Phase Crystallized Polycrystalline Silicon

    NARCIS (Netherlands)

    Sharma, K.; Branca, A.; Illiberi, A.; Tichelaar, F. D.; Creatore, M.; M. C. M. van de Sanden,

    2011-01-01

    In this paper the effect of the microstructure of remote plasma-deposited amorphous silicon films on the grain size development in polycrystalline silicon upon solid-phase crystallization is reported. The hydrogenated amorphous silicon films are deposited at different microstructure parameter values

  15. Structural models for amorphous transition metal binary alloys

    International Nuclear Information System (INIS)

    A dense random packing of 445 hard spheres with two different diameters in a concentration ratio of 3 : 1 was hand-built to simulate the structure of amorphous transition metal-metalloid alloys. By introducing appropriate pair potentials of the Lennard-Jones type, the structure is dynamically relaxed by minimizing the total energy. The radial distribution functions (RDF) for amorphous Fe0.75P0.25, Ni0.75P0.25, Co0.75P0.25 are obtained and compared with the experimental data. The calculated RDF's are resolved into their partial components. The results indicate that such dynamically constructed models are capable of accounting for some subtle features in the RDF of amorphous transition metal-metalloid alloys

  16. Neutron scattering studies of amorphous Invar alloys

    Energy Technology Data Exchange (ETDEWEB)

    Fernandez-Baca, J.A.

    1989-01-01

    This paper reviews recent inelastic neutron scattering experiments performed to study the spin dynamics of two amorphous Invar systems: Fe/sub 100-x/B/sub x/ and Fe/sub 90-x/Ni/sub x/Zr/sub 10/. As in crystalline Invar Fe/sub 65/Ni/sub 35/ and Fe/sub 3/Pt, the excitation of conventional long-wavelength spin waves in these amorphous systems cannot account for the relatively rapid change of their magnetization with temperature. These results are discussed in terms of additional low-lying excitations which apparently have a density of states similar to the spin waves.

  17. Hydrogen, microstructure and defect density in hydrogenated amorphous silicon

    OpenAIRE

    Roca I Cabarrocas, Pere; Djebbour, Z.; Kleider, J.; Longeaud, C.; Mencaraglia, D.; Sib, J.; Bouizem, Y.; Thèye, M.; Sardin, G.; Stoquert, J.

    1992-01-01

    It is well established that by bonding with the dangling bonds of silicon, hydrogen reduces the density of states of amorphous silicon and renders this material suitable to electronic applications. For so-called “standard” a-Si : H films deposited by the RF glow discharge decomposition of silane at low deposition rates (≈1 Å/s) and over a large range of deposition temperatures, we observed the usual correlation between the hydrogen bonding and the defect density in the as-deposited material o...

  18. Wannier function analysis of silicon-carbon alloys

    CERN Document Server

    Fitzhenry, P; Marks, N A; Cooper, N C; McKenzie, D R

    2003-01-01

    Maximally localized Wannier functions are the basis of a new technique for resolving ambiguous bonding issues for amorphous materials. Geometrical methods using the Wannier function representation provide an insightful chemical picture of local bonding and hybridization in disordered structures. Central to these methods is the notion of treating the Wannier function centres as a virtual atomic species with a well-defined degree of localization. Using Wannier function methods, we classify and quantify the types of bonding present in a sample of the ternary alloy hydrogenated amorphous silicon carbide, C sub 2 sub 2 Si sub 2 sub 2 H sub 2 sub 0. In addition to the bonding previously observed for this material, we see three-centre bonding and flipping bonds. We identify a cluster defect in our sample associated with these flipping bonds, and observe a temperature dependence of the bond flipping. This effect may be observable using temperature-dependent Raman spectroscopy.

  19. Amorphous coatings deposited on aluminum alloy by plasma electrolytic oxidation

    Institute of Scientific and Technical Information of China (English)

    GUAN Yong-jun; XIA Yuan

    2005-01-01

    Amorphous [Al-Si-O] coatings were deposited on aluminum alloy by plasma electrolytic oxidation (PEO). The process parameters, composition, micrograph, and mechanical property of PEO amorphous coatings were investigated. It is found that the growth rate of PEO coatings reaches 4.44 μm/min if the current density is 0.9 mA/mm2. XRD results show that the PEO coatings are amorphous in the current density range of 0.3 - 0.9mA/mm2. EDS results show that the coatings are composed of O, Si and Al elements. SEM results show that the coatings are porous. Nano indentation results show that the hardness of the coatings is about 3 - 4 times of that of the substrate, while the elastic modulus is about the same with the substrate. Furthermore, a formation mechanism of amorphous PEO coatings was proposed.

  20. Photo stability Assessment in Amorphous-Silicon Solar Cells

    International Nuclear Information System (INIS)

    The present status of amorphous-silicon-solar-cell research and development at CIEMAT requires the possibility to characterise the devices prepared from the point of view of their stability against sunlight exposure. Therefore a set of tools providing such a capacity has been developed. Together with an introduction to photovoltaic applications of amorphous silicon and to the photodegradation problem, the present work describes the process of setting up these tools. An indoor controlled photodegradation facility has been designed and built, and a procedure has been developed for the measurement of J-V characterisation in well established conditions. This method is suitable for all kinds of solar cells, even for those for which no model is still available. The photodegradation and characterisation of some cells has allowed to validate both the new testing facility and method. (Author) 14 refs

  1. Amorphous silicon based large format uncooled FPA microbolometer technology

    Science.gov (United States)

    Schimert, T.; Brady, J.; Fagan, T.; Taylor, M.; McCardel, W.; Gooch, R.; Ajmera, S.; Hanson, C.; Syllaios, A. J.

    2008-04-01

    This paper presents recent developments in next generation microbolometer Focal Plane Array (FPA) technology at L-3 Communications Infrared Products (L-3 CIP). Infrared detector technology at L-3 CIP is based on hydrogenated amorphous silicon (a-Si:H) and amorphous silicon germanium(a-SiGe:H). Large format high performance, fast, and compact IR FPAs are enabled by a low thermal mass pixel design; favorable material properties; an advanced ROIC design; and wafer level packaging. Currently at L-3 CIP, 17 micron pixel FPA array technology including 320x240, 640 x 480 and 1024 x768 arrays is under development. Applications of these FPAs range from low power microsensors to high resolution near-megapixel imager systems.

  2. Spherical silicon photonic microcavities: From amorphous to polycrystalline

    Science.gov (United States)

    Fenollosa, R.; Garín, M.; Meseguer, F.

    2016-06-01

    Shaping silicon as a spherical object is not an obvious task, especially when the object size is in the micrometer range. This has the important consequence of transforming bare silicon material in a microcavity, so it is able to confine light efficiently. Here, we have explored the inside volume of such microcavities, both in their amorphous and in their polycrystalline versions. The synthesis method, which is based on chemical vapor deposition, causes amorphous microspheres to have a high content of hydrogen that produces an onionlike distributed porous core when the microspheres are crystallized by a fast annealing regime. This substantially influences the resonant modes. However, a slow crystallization regime does not yield pores, and produces higher-quality-factor resonances that could be fitted to the Mie theory. This allows the establishment of a procedure for obtaining size calibration standards with relative errors of the order of 0.1%.

  3. Electrochemical degradation of amorphous-silicon photovoltaic modules

    Science.gov (United States)

    Mon, G. R.; Ross, R. G., Jr.

    1985-01-01

    Techniques of module electrochemical corrosion research, developed during reliability studies of crystalline-silicon modules (C-Si), have been applied to this new investigation into amorphous-silicon (a-Si) module reliability. Amorphous-Si cells, encapsulated in the polymers polyvinyl butyral (PVB) and ethylene vinyl acetate (EVA), were exposed for more than 1200 hours in a controlled 85 C/85 percent RH environment, with a constant 500 volts applied between the cells and an aluminum frame. Plotting power output reduction versus charge transferred reveals that about 50 percent a-Si cell failures can be expected with the passage of 0.1 to 1.0 Coulomb/cm of cell-frame edge length; this threshold is somewhat less than that determined for C-Si modules.

  4. Charged particle detectors made from thin layers of amorphous silicon

    International Nuclear Information System (INIS)

    A series of experiments was conducted to determine the feasibility of using hydrogenated amorphous silicon (α-Si:H) as solid state thin film charged particle detectors. 241Am alphas were successfully detected with α-Si:H devices. The measurements and results of these experiments are presented. The problems encountered and changes in the fabrication of the detectors that may improve the performance are discussed

  5. Amorphous Silicon 16—bit Array Photodetector①

    Institute of Scientific and Technical Information of China (English)

    ZHANGShaoqiang; XUZhongyang; 等

    1997-01-01

    An amorphous silicon 16-bit array photodetector with the a-SiC/a-Si heterojunction diode is presented.The fabrication processes of the device were studied systematically.By the optimum of the diode structure and the preparation procedures,the diode with Id<10-12A/mm2 and photocurrentIp≥0.35A/W has been obtained at the wavelength of 632nm.

  6. Corrosion In Amorphous-Silicon Solar Cells And Modules

    Science.gov (United States)

    Mon, Gordon R.; Wen, Liang-Chi; Ross, Ronald G., Jr.

    1988-01-01

    Paper reports on corrosion in amorphous-silicon solar cells and modules. Based on field and laboratory tests, discusses causes of corrosion, ways of mitigating effects, and consequences for modules already in field. Suggests sealing of edges as way of reducing entry of moisture. Cell-free perimeters or sacrificial electrodes suggested to mitigate effects of sorbed moisture. Development of truly watertight module proves to be more cost-effective than attempting to mitigate effects of moisture.

  7. Thermally stimulated H emission and diffusion in hydrogenated amorphous silicon

    OpenAIRE

    Abtew, T. A.; Inam, F.; Drabold, D. A.

    2006-01-01

    We report first principles ab initio density functional calculations of hydrogen dynam- ics in hydrogenated amorphous silicon. Thermal motion of the host Si atoms drives H diffusion, as we demonstrate by direct simulation and explain with simple models. Si-Si bond centers and Si ring centers are local energy minima as expected. We also describe a new mechanism for break- ing Si-H bonds to release free atomic H into the network: a fluctuation bond center detachment (FBCD) assisted diffusion. H...

  8. Crystallization of amorphous silicon induced by mechanical shear deformations

    OpenAIRE

    Kerrache, Ali; Mousseau, Normand; Lewis, Laurent J.

    2011-01-01

    We have investigated the response of amorphous silicon (a-Si), in particular crystallization, to external mechanical shear deformations using classical molecular dynamics (MD) simulations and the empirical Environment Dependent Inter-atomic Potential (EDIP) [Phys. Rev. B 56, 8542 (1997)]. In agreement with previous results we find that, at low shear velocity and low temperature, shear deformations increase disorder and defect density. At high temperatures, however, the deformations are found ...

  9. Deposition-induced defect profiles in amorphous hydrogenated silicon

    OpenAIRE

    Hata, N.; Wagner, S.; Roca i Cabarrocas, P.; Favre, M.

    2008-01-01

    The thickness dependence of the subgap optical absorption in plasma-deposited hydrogenated amorphous silicon is carefully studied by photothermal deflection spectroscopy. The deep-level defect concentration decays from the top surface into the bulk where it approaches the thermal equilibrium defect density. This defect profile is interpreted in terms of the annealing, during growth, of growth-induced surface defects. It is also shown that this defect profile is compatible with the known growt...

  10. First-principles study of hydrogenated amorphous silicon

    OpenAIRE

    Jarolimek, K.; de Groot, R. A.; de Wijs, G. A.; Zeman, M.

    2009-01-01

    We use a molecular-dynamics simulation within density-functional theory to prepare realistic structures of hydrogenated amorphous silicon. The procedure consists of heating a crystalline structure of Si64H8 to 2370 K, creating a liquid and subsequently cooling it down to room temperature. The effect of the cooling rate is examined. We prepared a total of five structures which compare well to experimental data obtained by neutron-scattering experiments. Two structures do not contain any struct...

  11. Optical characterization and density of states determination of silicon nanocrystals embedded in amorphous silicon based matrix

    International Nuclear Information System (INIS)

    We present a non-destructive measurement and simple analysis method for obtaining the absorption coefficient of silicon nanocrystals (NCs) embedded in an amorphous matrix. This method enables us to pinpoint the contribution of silicon NCs to the absorption spectrum of NC containing films. The density of states (DOS) of the amorphous matrix is modelled using the standard model for amorphous silicon while the NCs are modelled using one Gaussian distribution for the occupied states and one for the unoccupied states. For laser annealed a-Si0.66O0.34:H films, our analysis shows a reduction of the NC band gap from approximately 2.34–2.08 eV indicating larger mean NC size for increasing annealing laser fluences, accompanied by a reduction in NC DOS distribution width from 0.28–0.26 eV, indicating a narrower size distribution. (paper)

  12. Simulation study for atomic size and alloying effects during forming processes of amorphous alloys

    Institute of Scientific and Technical Information of China (English)

    ZHENG Caixing; LIU Rangsu; PENG Ping; ZHOU Qunyi

    2004-01-01

    A molecular dynamics (MD) simulation study has been performed for the solidification processes of two binary liquid alloys Ag6Cu4 and CuNi by adopting the quantum Sutton-Chen many-body potentials. By analyzing bond-types, it is demonstrated that at the cooling rate of 2×1012K/s, the CuNi forms fcc crystal structures, while the Ag6Cu4 forms amorphous structures. The original reason is that the atomic radius ratio (1.13) of the CuAg is bigger than that (1.025) of the CuNi. This shows that the atomic size difference is indeed the main factor for forming amorphous alloys. Moreover, for Ag60Cu40,corresponding to the deep eutectic point in the phase diagram, it forms amorphous structure easily. This confirms that as to the forming tendency and stability of amorphous alloys, the alloying effect plays a key role. In addition, having analyzed the transformation of microstructures by using the bond-type index and cluster-type index methods, not only the key role of the icosahedral configuration to the formation and stability of amorphous alloys can be explained, but also the solidification processes of liquid metals and the characteristics of amorphous structures can be further understood.

  13. TEM study of amorphous alloys produced by ion implantation

    International Nuclear Information System (INIS)

    Ion implantation is a technique for introducing foreign elements into surface layers of solids. Ions, as a suitably accelerated beam, penetrate the surface, slow down by collisions with target atoms to produce a doped layer. This non-equilibrium technique can provide a wide range of alloys without the restrictions imposed by equilibrium phase diagrams. This paper reports on the production of some amorphous transition metal-metalloid alloys by implantation. Thinned foils of Ni, Fe and stainless steel were implanted at room temperature with Dy+ and P+ ions at doses between 1013 - 1017 ions/cm2 at energies of 20 and 40 keV respectively. Transmission electron microscopy and selected area diffraction analysis were used to investigate the implanted specimens. Radial diffracted intensity measurements confirmed the presence of an amorphous implanted layer. The peak positions of the maxima are in good agreement with data for similar alloys produced by conventional techniques. Only certain ion/target combinations produce these amorphous layers. Implantations at doses lower than those needed for amorphization often result in formation of new crystalline phases such as an h.c.p. phase in nickel and a b.c.c. phase in stainless steel. (Auth.)

  14. Developments in the Ni-Nb-Zr amorphous alloy membranes

    Science.gov (United States)

    Sarker, S.; Chandra, D.; Hirscher, M.; Dolan, M.; Isheim, D.; Wermer, J.; Viano, D.; Baricco, M.; Udovic, T. J.; Grant, D.; Palumbo, O.; Paolone, A.; Cantelli, R.

    2016-03-01

    Most of the global H2 production is derived from hydrocarbon-based fuels, and efficient H2/CO2 separation is necessary to deliver a high-purity H2 product. Hydrogen-selective alloy membranes are emerging as a viable alternative to traditional pressure swing adsorption processes as a means for H2/CO2 separation. These membranes can be formed from a wide range of alloys, and those based on Pd are the closest to commercial deployment. The high cost of Pd (USD ~31,000 kg-1) is driving the development of less-expensive alternatives, including inexpensive amorphous (Ni60Nb40)100- x Zr x alloys. Amorphous alloy membranes can be fabricated directly from the molten state into continuous ribbons via melt spinning and depending on the composition can exhibit relatively high hydrogen permeability between 473 and 673 K. Here we review recent developments in these low-cost membrane materials, especially with respect to permeation behavior, electrical transport properties, and understanding of local atomic order. To further understand the nature of these solids, atom probe tomography has been performed, revealing amorphous Nb-rich and Zr-rich clusters embedded in majority Ni matrix whose compositions deviated from the nominal overall composition of the membrane.

  15. Surface bioactivity of plasma implanted silicon and amorphous carbon

    Institute of Scientific and Technical Information of China (English)

    Paul K CHU

    2004-01-01

    Plasma immersion ion implantation and deposition (PⅢ&D) has been shown to be an effective technique to enhance the surface bioactivity of materials. In this paper, recent progress made in our laboratory on plasma surface modification single-crystal silicon and amorphous carbon is reviewed. Silicon is the most important material in the integrated circuit industry but its surface biocompatibility has not been investigated in details. We have recently performed hydrogen PⅢ into silicon and observed the biomimetic growth of apatite on its surface in simulated body fluid. Diamond-like carbon (DLC) is widely used in the industry due to its excellent mechanical properties and chemical inertness. The use of this material in biomedical engineering has also attracted much attention. It has been observed in our laboratory that doping DLC with nitrogen by means of PⅢ can improve the surface blood compatibility. The properties as well as in vitro biological test results will be discussed in this article.

  16. Properties and application of hydrogenated amorphous silicon films

    Energy Technology Data Exchange (ETDEWEB)

    Geiger, J.

    1985-04-12

    Hydrogenated amorphous silicon (a-Si:H) films have found increasing applications in the last few years, in particular for thin film solar cells. Efficiencies of around 10% have been achieved and the field is still rapidly developing. Three main methods are used to deposite a-Si:H, i.e. the decomposition of silane in a glow discharge, the reactive sputtering of silicon in an Ar-H2 atmosphere and the reactive evaporation of silicon in atomic hydrogen. The basic properties of the film, i.e. structure, electrical and photoelectrical properties and the density of states in the gap, are reviewed. Advantages and disadvantages of the three methods are discussed, also with regard to the applications. (orig.).

  17. Correlation of atomic packing with the boson peak in amorphous alloys

    International Nuclear Information System (INIS)

    Boson peaks (BP) have been observed from phonon specific heats in 10 studied amorphous alloys. Two Einstein-type vibration modes were proposed in this work and all data can be fitted well. By measuring and analyzing local atomic structures of studied amorphous alloys and 56 reported amorphous alloys, it is found that (a) the BP originates from local harmonic vibration modes associated with the lengths of short-range order (SRO) and medium-range order (MRO) in amorphous alloys, and (b) the atomic packing in amorphous alloys follows a universal scaling law, i.e., the ratios of SRO and MRO lengths to solvent atomic diameter are 3 and 7, respectively, which exact match with length ratios of BP vibration frequencies to Debye frequency for the studied amorphous alloys. This finding provides a new perspective for atomic packing in amorphous materials, and has significant implications for quantitative description of the local atomic orders and understanding the structure-property relationship.

  18. Cyclic and Linear Polarization of Yttrium-Containing Iron-Based Amorphous Alloys

    Energy Technology Data Exchange (ETDEWEB)

    Day, S D; Lian, T; Farmer, J C; Rebak, R B

    2007-08-10

    Iron-based amorphous alloys are produced by rapid solidification from the melt. These alloys may possess unique mechanical and corrosion resistant properties. The chemical composition of the alloy may influence the cooling rate that is necessary for the alloys to be completely vitreous. At the same time, the corrosion resistance of the amorphous alloys may also depend on their chemical composition. This paper examines the anodic behavior of iron-based amorphous alloys containing three different concentrations (1, 3 and 5 atomic %) of yttrium (Y) in several electrolyte solutions. Results from polarization resistance potentiodynamic polarization show that when the alloy contains 5% atomic Y, the corrosion resistance decreases.

  19. Barkhausen effect during hydrogen interaction with amorphous alloy 2NSR

    International Nuclear Information System (INIS)

    The Barkhausen effect electromotive force measurements by the two-side saturation of the 2NSR (Fe78B12Si19Ni1) alloy amorphous band through hydrogen is carried out. The multiple increase in the Barkhausen effect electromotive force by hydrogen saturation is determined. It is assumed that in the metallic alloy over-saturated by hydrogen there originates a special structural state providing for decrease in the potential barrier by transition of the 180 deg boundary of the magnetic domain from the equilibrium state to another one. The value of the Barkhausen effect link with the hydrogen content in the material is indicated

  20. Properties of amorphous FeCoB alloy particles (abstract)

    DEFF Research Database (Denmark)

    Charles, S. W.; Wells, S.; Meagher, A.;

    1988-01-01

    Amorphous and crystalline alloy particles (0.05–0.5 nm) of FexCoyBz in which the ratio x:y ranges from 0 to 1 have been prepared by the borohydride reduction of iron and cobalt salts in aqueous solution. The structure of the particles has been studied using Mössbauer spectroscopy and x....... 1). It has been shown that the fraction of boron in the alloys (10–35 at. %) is dependent upon the rate of addition of salts to borohydride and the concentration of cobalt present; this in turn influences the crystallinity and magnetic properties . Journal of Applied Physics is copyrighted...

  1. Atomic structure of Re-Si amorphous alloys

    International Nuclear Information System (INIS)

    The atomic structure of Re100-xSix (x=0, 4, 11, 20, 31, 47, 54, 70, 82, 88, 100) amorphous alloys (AA) was studied by X-ray diffraction. In as-quenched alloys two amorphous phase were observed: the AI-phase-10-90 at.% Si and AII-phase-45-100 at.% Si, especially that in the composition range 45-90 at.% Si is the coexistence of two phase AI and AII. A comparison of the short range order parameters of the AA and those of the corresponding crystalline compounds has been done. The short-range order of AI-phase and coordination polyhedrons of Re5Si3, ReSi2 compounds is similar. Contrary to the Gaskell's model for metal-metalloid AA (trigonal prismatic structural unit) it seems to be tetragonal antiprism. The structure of AII-phase is the same as a-Si. (orig.)

  2. Blistering and flaking of amorphous alloys bombarded with He ions

    International Nuclear Information System (INIS)

    The blistering and flaking behavior of many kinds of amorphous alloys under helium ion bombardment at room temperature was investigated. Helium ions with energies of 40 keV and 60 keV was implanted within the fluence range (1.0-4.0) x 1018 ions/cm2. The surface topography of samples after irradiation was observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different fluences, energies and amorphous alloys, such as flaking, blistering, exfoliation, blister rupture, second generation blistering and porous structure. The dependence of surface damage modes and the critical fluence for the onset of blistering and flaking on the sort of materials and ion energy was discussed

  3. Ion beam mixing in binary amorphous metallic alloys

    International Nuclear Information System (INIS)

    Ion beam mixing (IM) was measured in homogeneous amorphous metallic alloys of Cu-Er and Ni-Ti as a function of temperature using tracer impurities, i.e., the so-called ''marker geometry''. In Cu-Er, a strong temperature dependence in IM was observed between 80 and 3730K, indicating that radiation-enhanced diffusion mechanisms are operative in this metallic glass. Phase separation of the Cu-Er alloy was also observed under irradiation as Er segregated to the vacuum and SiO2 interfaces of the specimen. At low-temperatures, the amount of mixing in amorphous Ni-Ti is similar to that in pure Ni or Ti, but it is much greater in Cu-Er than in either Cu or Er

  4. The U.S. and Japanese amorphous silicon technology programs A comparison

    Science.gov (United States)

    Shimada, K.

    1984-01-01

    The U.S. Department of Energy/Solar Energy Research Institute Amorphous Silicon (a-Si) Solar Cell Program performs R&D on thin-film hydrogenated amorphous silicon for eventual development of stable amorphous silicon cells with 12 percent efficiency by 1988. The Amorphous Silicon Solar Cell Program in Japan is sponsored by the Sunshine Project to develop an alternate energy technology. While the objectives of both programs are to eventually develop a-Si photovoltaic modules and arrays that would produce electricity to compete with utility electricity cost, the U.S. program approach is research oriented and the Japanese is development oriented.

  5. DOMAIN WALL PINNING IN INHOMOGENEOUSLY DEFORMED AMORPHOUS ALLOYS

    OpenAIRE

    Gibbs, M.; Evetts, J.; Horton, M.

    1980-01-01

    Inhomogeneous deformation in amorphous alloys is characterized by local regions of intense shear. Experiments on VITROVAC 0040 (Fe40Ni40B20) supplied by Vacuumschmelze (Hanau, Germany) show a direct correlation between the number density of the shear bands and the coercive field after inhomogeneous deformation by cold rolling. The deformation process is also shown to induce an off axis magnetic anisotropy whose mean value is large compared to other residual and induced anisotropies in these m...

  6. Crystallization of amorphous Hf100-xCux alloys

    International Nuclear Information System (INIS)

    The crystallization of Hf100-xCux (x=33, 44, 50, 59) amorphous alloys was studied by the TDPAC technique. The different stages in the transformation towards equilibrium were investigated through the evolution of the quadrupole perturbation after thermal annealings. The crystallization kinetics of Hf67Cu33 and Hf56Cu44 was analyzed using the Johnson-Mehl-Avrami equation. General trends in the crystallization behavior are discussed. (orig.)

  7. Grain boundary resistance to amorphization of nanocrystalline silicon carbide

    Science.gov (United States)

    Chen, Dong; Gao, Fei; Liu, Bo

    2015-11-01

    Under the C displacement condition, we have used molecular dynamics simulation to examine the effects of grain boundaries (GBs) on the amorphization of nanocrystalline silicon carbide (nc-SiC) by point defect accumulation. The results show that the interstitials are preferentially absorbed and accumulated at GBs that provide the sinks for defect annihilation at low doses, but also driving force to initiate amorphization in the nc-SiC at higher doses. The majority of surviving defects are C interstitials, as either C-Si or C-C dumbbells. The concentration of defect clusters increases with increasing dose, and their distributions are mainly observed along the GBs. Especially these small clusters can subsequently coalesce and form amorphous domains at the GBs during the accumulation of carbon defects. A comparison between displacement amorphized nc-SiC and melt-quenched single crystal SiC shows the similar topological features. At a dose of 0.55 displacements per atom (dpa), the pair correlation function lacks long range order, demonstrating that the nc-SiC is fully amorphilized.

  8. Formation of nano-porous GeOx by de-alloying of an Al–Ge–Mn amorphous alloy

    International Nuclear Information System (INIS)

    The present study shows that nanometer-scale amorphous phase separation occurs by spinodal decomposition of the undercooled liquid in a melt-spun Al60Ge30Mn10 alloy, although there is no atomic pair with positive enthalpy of mixing. By adopting a proper de-alloying process, an interconnected nano-porous germanium oxide with an amorphous structure is successfully synthesized. The present study shows that nano-porous amorphous germanium oxide can be easily obtained by de-alloying of Al-based amorphous alloys with nm-scale composition fluctuation

  9. Structure and Optical Properties of Silicon Nanocrystals Embedded in Amorphous Silicon Thin Films Obtained by PECVD

    Directory of Open Access Journals (Sweden)

    B. M. Monroy

    2011-01-01

    Full Text Available Silicon nanocrystals embedded in amorphous silicon matrix were obtained by plasma enhanced chemical vapor deposition using dichlorosilane as silicon precursor. The RF power and dichlorosilane to hydrogen flow rate ratio were varied to obtain different crystalline fractions and average sizes of silicon nanocrystals. High-resolution transmission electron microscopy images and RAMAN measurements confirmed the existence of nanocrystals embedded in the amorphous matrix with average sizes between 2 and 6 nm. Different crystalline fractions (from 12% to 54% can be achieved in these films by regulating the selected growth parameters. The global optical constants of the films were obtained by UV-visible transmittance measurements. Effective band gap variations from 1.78 to 2.3 eV were confirmed by Tauc plot method. Absorption coefficients higher than standard amorphous silicon were obtained in these thin films for specific growth parameters. The relationship between the optical properties is discussed in terms of the different internal nanostructures of the samples.

  10. NEW METHOD OF PRODUCTION OF ALUNINUM SILICON ALLOYS

    OpenAIRE

    V. K. Afanasiev; E. L. Marukovich; M. N. Churik; V. V. Gertsen; A. V. Gorshenin; A. A. Samon

    2015-01-01

    A new approach to the preparation of aluminum-silicon alloys, based on the concept of the leading role of hydrogen in determining the structure and properties of alloys consists in using as charge materials of silicon dioxide (silica) and hydrogen instead of crystalline silicon was described. Practical ways to implement the new method were proposed on the example of industrial alloys prepared on charge synthetic alloy. It is shown that the application of the proposed method allows to improve ...

  11. Damage at hydrogenated amorphous/crystalline silicon interfaces by indium tin oxide overlayer sputtering

    OpenAIRE

    Demaurex, Bénédicte; De Wolf, Stefaan; Descoeudres, Antoine; Charles Holman, Zachary; Ballif, Christophe

    2012-01-01

    Damage of the hydrogenated amorphous/crystalline silicon interface passivation during transparent conductive oxide sputtering is reported. This occurs in the fabrication process of silicon heterojunction solar cells. We observe that this damage is at least partially caused by luminescence of the sputter plasma. Following low-temperature annealing, the electronic interface properties are recovered. However, the silicon-hydrogen configuration of the amorphous silicon film is permanently changed...

  12. Experiment and Simulation Study on the Amorphous Silicon Photovoltaic Walls

    OpenAIRE

    Wenjie Zhang; Bin Hao; Nianping Li

    2014-01-01

    Based on comparative study on two amorphous silicon photovoltaic walls (a-Si PV walls), the temperature distribution and the instant power were tested; and with EnergyPlus software, similar models of the walls were built to simulate annual power generation and air conditioning load. On typical sunshine day, the corresponding position temperature of nonventilated PV wall was generally 0.5~1.5°C higher than that of ventilated one, while the power generation was 0.2%~0.4% lower, which was consis...

  13. Radiation damage and annealing of amorphous silicon solar cells

    Science.gov (United States)

    Byvik, C. E.; Slemp, W. S.; Smith, B. T.; Buoncristiani, A. M.

    1984-01-01

    Amorphous silicon solar cells were irradiated with 1 MeV electrons at the Space Environmental Effects Laboratory of the NASA Langley Research Center. The cells accumulated a total fluence of 10 to the 14th, 10 to the 15th, and 10 to the 16th electrons per square centimeter and exhibited increasing degradation with each irradiation. This degradation was tracked by evaluating the I-V curves for AM0 illumination and the relative spectral response. The observed radiation damage was reversed following an anneal of the cells under vacuum at 200 C for 2 hours.

  14. Study on stability of hydrogenated amorphous silicon films

    Institute of Scientific and Technical Information of China (English)

    Zhu Xiu-Hong; Chen Guang-Hua; Zhang Wen-Li; Ding Yi; Ma Zhan-Jie; Hu Yue-Hui; He Bin; Rong Yan-Dong

    2005-01-01

    Hydrogenated amorphous silicon (a-Si:H) films with high and same order of magnitude photosensitivity (~105) but different stability were prepared by using microwave electron cyclotron resonance chemical vapour deposition system under the different deposition conditions. It was proposed that there was no direct correlation between the photosensitivity and the hydrogen content (CH) as well as H-Si bonding configurations, but for the stability, they were the critical factors. The experimental results indicated that higher substrate temperature, hydrogen dilution ratio and lower deposition rate played an important role in improving the microstructure of a-Si:H films. We used hydrogen elimination model to explain our experimental results.

  15. Atomistic models of hydrogenated amorphous silicon nitride from first principles

    OpenAIRE

    Jarolimek, K.; de Groot, R. A.; de Wijs, G. A.; Zeman, M.

    2010-01-01

    We present a theoretical study of hydrogenated amorphous silicon nitride (a-SiNx:H), with equal concentrations of Si and N atoms (x=1), for two considerably different densities (2.0 and 3.0 g/cm3). Densities and hydrogen concentration were chosen according to experimental data. Using first-principles molecular-dynamics within density-functional theory the models were generated by cooling from the liquid. Where both models have a short-range order resembling that of crystalline Si3N4 because o...

  16. Two-Level Systems in Evaporated Amorphous Silicon

    OpenAIRE

    Queen, D. R.; Liu, X.; Karel, J.; Jacks, H. C.; Metcalf, T. H.; Hellman, F.

    2015-01-01

    In $e$-beam evaporated amorphous silicon ($a$-Si), the densities of two-level systems (TLS), $n_{0}$ and $\\overline{P}$, determined from specific heat $C$ and internal friction $Q^{-1}$ measurements, respectively, have been shown to vary by over three orders of magnitude. Here we show that $n_{0}$ and $\\overline{P}$ are proportional to each other with a constant of proportionality that is consistent with the measurement time dependence proposed by Black and Halperin and does not require the i...

  17. Eigenmode Splitting in all Hydrogenated Amorphous Silicon Nitride Coupled Microcavity

    Institute of Scientific and Technical Information of China (English)

    ZHANG Xian-Gao; HUANG Xin-Fan; CHEN Kun-Ji; QIAN Bo; CHEN San; DING Hong-Lin; LIU Sui; WANG Xiang; XU Jun; LI Wei

    2008-01-01

    Hydrogenated amorphous silicon nitride based coupled optical microcavity is investigated theoretically and experimentally. The theoretical calculation of the transmittance spectra of optical microcavity with one cavity and coupled microcavity with two-cavity is performed.The optical eigenmode splitting for coupled microcavity is found due to the interaction between the neighbouring localized cavities.Experimentally,the coupled cavity samples are prepared by plasma enhanced chemical vapour deposition and characterized by photoluminescence measurements.It is found that the photoluminescence peak wavelength agrees well with the cavity mode in the calculated transmittance spectra.This eigenmode splitting is analogous to the electron state energy splitting in diatom molecules.

  18. Diffusion length measurements of thin amorphous silicon layers

    Science.gov (United States)

    van den Heuvel, J. C.; van Oort, R. C.; Geerts, M. J.

    1989-02-01

    A new method for the analysis of diffusion length measurements by the Surface Photovoltage (SPV) method is presented. It takes into account the effect of the reflection of light from the back contact in thin layers and the effect of a finite bandwidth of the used interference filters. The model was found to agree with experiments on thin amorphous silicon (a-Si:H) layers. It is shown that in the region were these effects are negligible this method is equivalent to the standard method.

  19. INFRARED VIBRATIONAL SPECTRA OF CHLORINATED AND HYDROGENATED AMORPHOUS SILICON

    OpenAIRE

    Kalem, S; Chevallier, J.; Al Dallal, S.; Bourneix, J.

    1981-01-01

    The infrared spectra of chlorinated and hydrogenated amorphous silicon have been measured. In addition to the hydrogen induced bands at 2110, 1990, 885, 840 and 640 cm-1, we observe two new modes at 545 cm-1 (Si-Cl stretching) and 500 cm-1 ( Si TO modes induced by chlorine). Observation of the 545 cm-1 band proves that chlorine acts as a dangling bond terminator. Upon annealing, some of the Si-Cl groups transform into SiCl4 molecules (SiCl4 stretching at 615 cm-1). A good agreement is found b...

  20. Role of localized states in amorphous silicon tunnel barriers

    International Nuclear Information System (INIS)

    Results of an experimental study of the role of localized states in amorphous silicon tunneling barriers are reported. Composite barriers formed of multilayers of SiOx and a-Si, the latter containing a known density of localized states, have been developed in which the dominant tunneling mechanism can be made to be either direct or resonant tunneling. The effect of these localized states on the behavior of the conductance with barrier thickness, and on the superconducting tunneling current-voltage characteristics, is described

  1. A structural study of CN treated amorphous silicon

    Science.gov (United States)

    Yamazaki, Yuji; Shirai, Koun; Katayama-Yoshida, Hiroshi

    2003-06-01

    Recently, a remarkable technique to overcome the problem of light-induced degradation in amorphous silicon (a-Si) solar cells using a cyanide (CN) treatment has been developed. Structural and bonding characteristics of CN in a-Si has been studied using ab initio molecular dynamics simulations. It was found that CN incorporation results in more than just the termination of dangling bonds. The connectivity of the covalent random network increases because the CN changes from triply bonded, which is a common form in molecular CN, to the singly bonded form. This may be the mechanism by which CN incorporation produces significant reductions in light-induced degradation.

  2. Elimination of residual stress in hydrogenated amorphous silicon films

    Energy Technology Data Exchange (ETDEWEB)

    Jones, P.L.; Korhonen, A.S.; Dimmey, L.J.; Cocks, F.H.; Pollock, J.T.A.

    1982-02-01

    Residual stresses were measured in hydrogenated amorphous silicon films produced by glow discharge decomposition of silane and deposited onto aluminium, Invar (36Ni-64Fe), copper and nickel substrates. The substrate temperatures were in the range 54-295/sup 0/C during deposition. For low deposition temperatures, all films irrespective of substrate exhibited compressive room temperature residual stresses ranging from -60 to -120 mPa. A major fraction of this residual stress is found to come from the intrinsic deposition stress, which has complex origins relating to deposition and substrate conditions. With aluminium substrates, increasing the deposition temperature increased the compressive residual stress, primarily because of the difference between the thermal expansion coefficients of silicon and aluminium. However, with Invar substrates, films deposited at 225/sup 0/C exhibited a zero residual stress at room temperature because of a balancing of the compressive intrinsic deposition stress with the tensile stress produced during cooling by the low thermal expansion of the Invar.

  3. Surface-Activated Amorphous Alloy Fuel Electrodes for Methanol Fuel Cell

    OpenAIRE

    Kawashima, Asahi; Hashimoto, Koji

    1983-01-01

    Amorphous alloy electrodes for electrochemical oxidation of methanol and its derivatives were obtained by the surface activation treatment consisting of electrodeposition of zinc on as-quenched amorphous alloy substrates, heating at 200-300℃ for 30 min, and subsequently leaching of zinc in an alkaline solution. The surface activation treatment provided a new method for the preparation of a large surface area on the amorphous alloys. The best result for oxidation of methanol, sodium formate an...

  4. Effect of cobalt on the corrosion behaviour of amorphous Fe-Co-Cr-B-Si alloys in dilute mineral acids

    International Nuclear Information System (INIS)

    The aim of this paper was to investigate the effect of increasing cobalt content on the corrosion resistance of the Fe-Co-Cr-B-Si alloys in dilute mineral acids. The corrosion rates in 0.5N HCl, 1N HCl and 1N H2SO4 significantly decrease with an increase in cobalt content. The alloys with a larger amount of cobalt can passivate spontaneously. The high corrosion resistance of the Fe-Co-Cr-B-Si alloys is also due to the formation of chromium -enriched passive film. Generally, the corrosion resistance of chromium -bearing alloy is improved by alloying with various metalloids but it is lowered by addition of boron and silicon. The corrosion behaviour of the amorphous Fe75-xCoxCr1B7Si17 alloys obtained by the melt-spinning technique was studied using gravimetric method. The best results were obtained with Fe65Co10Cr1B7Si17 alloy. The studied amorphous alloy ribbons exhibit not only excellent physical properties which are useful for many electric and magnetic applications: magnetic sensors, power transformers, high frequency transformers, etc., but also a very good corrosion resistance which extend their application domain. (Author).

  5. Geometric photovoltaics applied to amorphous silicon thin film solar cells

    Science.gov (United States)

    Kirkpatrick, Timothy

    Geometrically generalized analytical expressions for device transport are derived from first principles for a photovoltaic junction. Subsequently, conventional planar and unconventional coaxial and hemispherical photovoltaic architectures are applied to detail the device physics of the junction based on their respective geometry. For the conventional planar cell, the one-dimensional transport equations governing carrier dynamics are recovered. For the unconventional coaxial and hemispherical junction designs, new multi-dimensional transport equations are revealed. Physical effects such as carrier generation and recombination are compared for each cell architecture, providing insight as to how non-planar junctions may potentially enable greater energy conversion efficiencies. Numerical simulations are performed for arrays of vertically aligned, nanostructured coaxial and hemispherical amorphous silicon solar cells and results are compared to those from simulations performed for the standard planar junction. Results indicate that fundamental physical changes in the spatial dependence of the energy band profile across the intrinsic region of an amorphous silicon p-i-n junction manifest as an increase in recombination current for non-planar photovoltaic architectures. Despite an increase in recombination current, however, the coaxial architecture still appears to be able to surpass the efficiency predicted for the planar geometry, due to the geometry of the junction leading to a decoupling of optics and electronics.

  6. Electrical characteristics of amorphous molybdenum-nickel contacts to silicon

    Science.gov (United States)

    Kung, K. T.-Y.; Nicolet, M.-A.; Suni, I.

    1984-01-01

    The electrical characteristics of sputtered, amorphous Mo-Ni contacts have been measured on both p- and n-type Si, as functions of composition (30, 54, and 58 at. percent Mo). The contact resistivity on both p(+) and n(+) Si is in the 0.00000 ohm sq cm range. The barrier height for as-deposited samples varies between phi-bp = 0.47-0.42 V on p-type Si and between phi-bn = 0.63-0.68 V on n-type Si, as the composition of the amorphous layer goes from Ni-rich to Mo-rich. The sum phi-bp + phi-bn always equals 1.12 V, within experimental error. After thermal treatment at 500 C for 1/2 h, the contact resistivity changes by a factor of two or less, while the barrier height changes by at most approximately 0.05 V. In light of these results, the amorphous Mo-Ni film makes good ohmic contacts to silicon.

  7. Theory of structural transformation in lithiated amorphous silicon.

    Science.gov (United States)

    Cubuk, Ekin D; Kaxiras, Efthimios

    2014-07-01

    Determining structural transformations in amorphous solids is challenging due to the paucity of structural signatures. The effect of the transitions on the properties of the solid can be significant and important for applications. Moreover, such transitions may not be discernible in the behavior of the total energy or the volume of the solid as a function of the variables that identify its phases. These issues arise in the context of lithiation of amorphous silicon (a-Si), a promising anode material for high-energy density batteries based on lithium ions. Recent experiments suggest the surprising result that the lithiation of a-Si is a two-phase process. Here, we present first-principles calculations of the structure of a-Si at different lithiation levels. Through a detailed analysis of the short and medium-range properties of the amorphous network, using Voronoi-Delaunay methods and ring statistics, we show that a-LixSi has a fundamentally different structure below and above a lithiation level corresponding to x ∼ 2. PMID:24911996

  8. Experimental and Computer Modelling Studies of Metastability of Amorphous Silicon Based Solar Cells

    NARCIS (Netherlands)

    Munyeme, Geoffrey

    2003-01-01

    We present a combination of experimental and computer modelling studies of the light induced degradation in the performance of amorphous silicon based single junction solar cells. Of particular interest in this study is the degradation kinetics of different types of amorphous silicon single junction

  9. High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells.

    Science.gov (United States)

    He, Rongrui; Day, Todd D; Sparks, Justin R; Sullivan, Nichole F; Badding, John V

    2016-07-01

    Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 °C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors. PMID:27174318

  10. Highly featured amorphous silicon nanorod arrays for high-performance lithium-ion batteries

    Energy Technology Data Exchange (ETDEWEB)

    Soleimani-Amiri, Samaneh; Safiabadi Tali, Seied Ali; Azimi, Soheil; Sanaee, Zeinab; Mohajerzadeh, Shamsoddin, E-mail: mohajer@ut.ac.ir [Thin Film and Nanoelectronics Lab, Nanoelectronics Center of Excellence, School of Electrical and Computer Engineering, University of Tehran, Tehran 143957131 (Iran, Islamic Republic of)

    2014-11-10

    High aspect-ratio vertical structures of amorphous silicon have been realized using hydrogen-assisted low-density plasma reactive ion etching. Amorphous silicon layers with the thicknesses ranging from 0.5 to 10 μm were deposited using radio frequency plasma enhanced chemical vapor deposition technique. Standard photolithography and nanosphere colloidal lithography were employed to realize ultra-small features of the amorphous silicon. The performance of the patterned amorphous silicon structures as a lithium-ion battery electrode was investigated using galvanostatic charge-discharge tests. The patterned structures showed a superior Li-ion battery performance compared to planar amorphous silicon. Such structures are suitable for high current Li-ion battery applications such as electric vehicles.

  11. Highly featured amorphous silicon nanorod arrays for high-performance lithium-ion batteries

    International Nuclear Information System (INIS)

    High aspect-ratio vertical structures of amorphous silicon have been realized using hydrogen-assisted low-density plasma reactive ion etching. Amorphous silicon layers with the thicknesses ranging from 0.5 to 10 μm were deposited using radio frequency plasma enhanced chemical vapor deposition technique. Standard photolithography and nanosphere colloidal lithography were employed to realize ultra-small features of the amorphous silicon. The performance of the patterned amorphous silicon structures as a lithium-ion battery electrode was investigated using galvanostatic charge-discharge tests. The patterned structures showed a superior Li-ion battery performance compared to planar amorphous silicon. Such structures are suitable for high current Li-ion battery applications such as electric vehicles

  12. Bonding tungsten, W–Cu-alloy and copper with amorphous Fe–W alloy transition

    International Nuclear Information System (INIS)

    W/Cu graded materials are the leading candidate materials used as the plasma facing components in a fusion reactor. However, tungsten and copper can hardly be jointed together due to their great differences in physical properties such as coefficient of thermal expansion and melting point, and the lack of solid solubility between them. To overcome those difficulties, a new amorphous Fe–W alloy transitional coating and vacuum hot pressing (VHP) method were proposed and introduced in this paper. The morphology, composition and structure of the amorphous Fe–W alloy coating and the sintering interface of the specimens were analyzed by scanning electron microscopy (SEM), energy dispersive spectrometer (EDS) and X-ray diffraction (XRD). The thermal shock resistance of the bonded composite was also tested. The results demonstrated that amorphous structure underwent change from amorphous to nano grains during joining process, and the joined W/Cu composite can endued plasma thermal shock resistance with energy density more than 5.33 MW/m2. It provides a new feasible technical to join refractory tungsten to immiscible copper with amorphous Fe–W alloy coating

  13. Amorphous structures of silicon carbonitride formed by high-dose nitrogen ion implantation into silicon carbide

    International Nuclear Information System (INIS)

    Short-range order in amorphous silicon carbonitride (a-SiCxNy) has been examined using transmission electron microscopy. Single crystals of 6H-SiC with [0 0 0 1] orientation were implanted with 180 keV nitrogen ions at ambient temperature to a fluence of 5 x 1017 N+/cm2, followed by thermally annealing at 1500 deg. C for 30 min. A fully amorphous layer was formed at the topmost layer in the as-implanted sample. A part of the amorphous phase transformed into crystalline SiC after annealing. Radial distribution functions extracted via nano-beam electron diffraction patterns clearly showed that atomistic structures of the ion-beam-induced amorphous phase are different from those of the remaining amorphous phase in the annealed sample: a-SiCxNy possesses an intermediate bond length between Si-C and Si-N, while Si-N and Si-C bonds become more pronounced in the amorphous layer of the annealed specimen

  14. First principles simulation of amorphous silicon bulk, interfaces, and nanowires for photovoltaics

    OpenAIRE

    Belayneh, Merid Legesse

    2015-01-01

    Amorphous silicon has become the material of choice for many technologies, with major applications in large area electronics: displays, image sensing and thin film photovoltaic cells. This technology development has occurred because amorphous silicon is a thin film semiconductor that can be deposited on large, low cost substrates using low temperature. In this thesis, classical molecular dynamics and first principles DFT calculations have been performed to generate structural models of amorph...

  15. Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide

    Directory of Open Access Journals (Sweden)

    Jia Ge

    2014-01-01

    Full Text Available We present an alternative method of depositing a high-quality passivation film for heterojunction silicon wafer solar cells, in this paper. The deposition of hydrogenated intrinsic amorphous silicon suboxide is accomplished by decomposing hydrogen, silane, and carbon dioxide in an industrial remote inductively coupled plasma platform. Through the investigation on CO2 partial pressure and process temperature, excellent surface passivation quality and optical properties are achieved. It is found that the hydrogen content in the film is much higher than what is commonly reported in intrinsic amorphous silicon due to oxygen incorporation. The observed slow depletion of hydrogen with increasing temperature greatly enhances its process window as well. The effective lifetime of symmetrically passivated samples under the optimal condition exceeds 4.7 ms on planar n-type Czochralski silicon wafers with a resistivity of 1 Ωcm, which is equivalent to an effective surface recombination velocity of less than 1.7 cms−1 and an implied open-circuit voltage (Voc of 741 mV. A comparison with several high quality passivation schemes for solar cells reveals that the developed inductively coupled plasma deposited films show excellent passivation quality. The excellent optical property and resistance to degradation make it an excellent substitute for industrial heterojunction silicon solar cell production.

  16. Effect of amorphous silicon carbide layer thickness on the passivation quality of crystalline silicon surface

    OpenAIRE

    Ferré Tomas, Rafel; Martín García, Isidro; Vetter, Michael; Garin Escriva, Moises; Alcubilla González, Ramón

    2005-01-01

    Surface passivation of p-type crystalline silicon wafers by means of phosphorus-doped hydrogenated amorphous silicon carbide films [a-SiCx(n):H] has been investigated. Particularly, we focused on the effects of layer thickness on the c-Si surface passivation quality resulting in the determination of the fixed charge density, Qf, within the a-SiCx(n):H film and the fundamental recombination of holes, Sp0. The main result is that surface recombination velocity decreases with film...

  17. Synthesis and characterization of a bulk amorphous alloy

    International Nuclear Information System (INIS)

    The production and characterization of bulk metallic glasses have been an area of intense focus in materials research for many years because of their superior mechanical properties over their crystalline counterparts. A bulk metallic glass Zr/sub 55/Cu/sub 30/Al/sub 10/Ni/sub 5/ has been synthesized by copper mold casting and characterized by differential scanning calorimetry and x-ray diffraction. Crystallization behavior of the alloy is discussed. Composite of amorphous glass was produced by adding SiC and hardness and tensile strength have been measured. (author)

  18. Amorphous magnetism in Mnx Sn1-x alloys

    International Nuclear Information System (INIS)

    Systematic low temperature in situ 119Sn Moessbauer effect (ME) studies in vapor quenched amorphous Mnx Sn1-x (0.09≤ x ≤0,95) alloys between 150 and 4.2 K, are presented. Its is shown that the magnetic behavior of the system is correctly displayed by the transferred magnetic hyperfine (hf) interactions, at the 119Sn site. A complete magnetic phase diagram is proposed, and the effect of an external magnetic field (up to about 3T) on the spin correlations in the spin-glass state is also discussed. (author)

  19. Megaelectron volt ion beam-induced epitaxy of deposited silicon and germanium-silicon alloys on (100) silicon substrates

    International Nuclear Information System (INIS)

    Solid phase heteroepitaxial crystallization of GexSi1-x/(100) Si was induced by MeV ion bombardment while heating the substrate at low temperatures. Rutherford Backscatter Spectrometry (RBS), Ion Channeling, Secondary Ion Mass Spectroscopy (SIMS) and transmission electron microscopy (TEM) techniques were used to investigate the kinetics of the reordering process as well as characterize the strain in the resultant epitaxial layer. The epitaxial recrystallization of amorphous silicon and silicon-germanium layers on (100)silicon, deposited under medium (10-7 torr) vacuum conditions, was induced by 2.5 MeV Ar beam irradiation in the low temperature range of 200-400C. The regrowth follows an Arrhenius dependence with temperature and activation energies of ∼0.3 eV were determined for the regrowth of deposited Si and a Ge38Si62 alloy. Ion beam induced heteroepitaxy was found to be sensitive to interfacial contaminants. In addition, the resultant crystalline quality for Ge-rich alloys was poor after irradiation. Ion beam induced heteroepitaxy of MBE-deposited GexSi1-x/(100) Si, deposited under high vacuum conditions after strict interfacial preparation, resulted in layer-by-layer reordering for alloys up to 65 at. % Ge. Coherently strained epilayers were reported for ion beam annealed GeSi alloys with germanium concentration less than 15 at. %. The pseudomorphic epilayers were characterized by planar and axial channeling to measure the tetragonal distortion in the strained overlayers. Strained films, produced by MeV Ar bombardment while heating the substrate at temperatures as low as 300C, were observed to relax following extended furnace anneals at temperatures of 800-900C. Such results offer the possibility of extending defect-free growth of metastable strained layers to other lattice mismatched systems

  20. Properties and Applications of Nanocrystalline Alloys from Amorphous Precursors

    CERN Document Server

    Idzikowski, Bogdan; Miglierini, Marcel

    2005-01-01

    Metallic (magnetic and non-magnetic) nanocrystalline materials have been known for over ten years but only recent developments in the research into those complex alloys and their metastable amorphous precursors have created a need to summarize the most important accomplishments in the field. This book is a collection of articles on various aspects of metallic nanocrystalline materials, and an attempt to address this above need. The main focus of the papers is put on the new issues that emerge in the studies of nanocrystalline materials, and, in particular, on (i) new compositions of the alloys, (ii) properties of conventional nanocrystalline materials, (iii) modeling and simulations, (iv) preparation methods, (v) experimental techniques of measurements, and (vi) different modern applications. Interesting phenomena of the physics of nanocrystalline materials are a consequence of the effects induced by the nanocrystalline structure. They include interface physics, the influence of the grain boundaries, the aver...

  1. Modelling structure and properties of amorphous silicon boron nitride ceramics

    Directory of Open Access Journals (Sweden)

    Johann Christian Schön

    2011-06-01

    Full Text Available Silicon boron nitride is the parent compound of a new class of high-temperature stable amorphous ceramics constituted of silicon, boron, nitrogen, and carbon, featuring a set of properties that is without precedent, and represents a prototypical random network based on chemical bonds of predominantly covalent character. In contrast to many other amorphous materials of technological interest, a-Si3B3N7 is not produced via glass formation, i.e. by quenching from a melt, the reason being that the binary components, BN and Si3N4, melt incongruently under standard conditions. Neither has it been possible to employ sintering of μm-size powders consisting of binary nitrides BN and Si3N4. Instead, one employs the so-called sol-gel route starting from single component precursors such as TADB ((SiCl3NH(BCl2. In order to determine the atomic structure of this material, it has proven necessary to simulate the actual synthesis route.Many of the exciting properties of these ceramics are closely connected to the details of their amorphous structure. To clarify this structure, it is necessary to employ not only experimental probes on many length scales (X-ray, neutron- and electron scattering; complex NMR experiments; IR- and Raman scattering, but also theoretical approaches. These address the actual synthesis route to a-Si3B3N7, the structural properties, the elastic and vibrational properties, aging and coarsening behaviour, thermal conductivity and the metastable phase diagram both for a-Si3B3N7 and possible silicon boron nitride phases with compositions different from Si3N4: BN = 1 : 3. Here, we present a short comprehensive overview over the insights gained using molecular dynamics and Monte Carlo simulations to explore the energy landscape of a-Si3B3N7, model the actual synthesis route and compute static and transport properties of a-Si3BN7.

  2. Infrared Insight into the Network of Hydrogenated Amorphous and Polycrystalline Silicon thin Films

    OpenAIRE

    Jarmila Mullerova

    2006-01-01

    IR measurements were carried out on both amorphous and polycrystalline silicon samples deposited by PECVD on glass substrate. The transition from amorphous to polycrystalline phase was achieved by increasing dilution of silane plasma at the deposition process. The samples were found to be mixed phase materials. Commonly, infrared spectra of hydrogenated silicon thin films yield information about microstructure, hydrogen content and hydrogen bonding to silicon. In this paper, addit...

  3. Calorimetry of dehydrogenation and dangling-bond recombination in several hydrogenated amorphous silicon materials

    OpenAIRE

    Roura Grabulosa, Pere; Farjas Silva, Jordi; Rath, Chandana; Serra-Miralles, J.; Bertrán Serra, Enric; Roca I Cabarrocas, Pere

    2006-01-01

    Differential scanning calorimetry (DSC) was used to study the dehydrogenation processes that take place in three hydrogenated amorphous silicon materials: nanoparticles, polymorphous silicon, and conventional device-quality amorphous silicon. Comparison of DSC thermograms with evolved gas analysis (EGA) has led to the identification of four dehydrogenation processes arising from polymeric chains (A), SiH groups at the surfaces of internal voids (A'), SiH groups at interfaces (B), and in the b...

  4. The influence of post-deposition annealing upon amorphous silicon/crystalline silicon heterojunction solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Mikolášek, Miroslav, E-mail: miroslav.mikolasek@stuba.sk [Slovak University of Technology, Faculty of Electrical Engineering and Information Technology, Ilkovičova 3, 812 19 Bratislava (Slovakia); Nemec, Michal; Kováč, Jaroslav [Slovak University of Technology, Faculty of Electrical Engineering and Information Technology, Ilkovičova 3, 812 19 Bratislava (Slovakia); Foti, Marina; Gerardi, Cosimo [IMS-R and D, STMicroelectronics, Stradale Primosole, 50, 95121 Catania (Italy); Mannino, Giovanni; Valenti, Luca; Lombardo, Salvatore [CNR-IMM, Zona Industriale, Ottava Strada, 5, 95121 Catania (Italy)

    2014-11-15

    Highlights: • We studied the impact of the thermal annealing on the silicon heterojunction solar cells. • Compared were samples deposited by ICP-CVD and PE-CVD methods. • Annealing up to 250 °C improves output performance of both solar cells. • Annealing above 250 °C increases defect states density at the interface and in the amorphous emitter. • Samples deposited by ICP-CVD shows better resistance against annealing. - Abstract: This paper presents a comparative study of the influence of post-deposition annealing on amorphous silicon/crystalline silicon heterojunction solar cells deposited by ICP-CVD and PE-CVD techniques. Two major effects on the solar cell efficiency occur caused by thermal annealing. The first effect is a slight improvement of the performance on annealing up to 250 °C. The second effect, for annealing temperatures above 250 °C, reveals deterioration of the solar cell performance. It is suggested that both effects are related to thermally activated diffusion of hydrogen. For low annealing temperatures, diffusion of weakly bonded hydrogen allows to passivate the defects in the amorphous emitter and at the heterointerface. In the high temperature annealing region, outdiffusion of hydrogen is assumed to be responsible for an increase of defect states in the structures. The results indicate a better stability after high temperature treatment for the sample prepared by ICP-CVD technology.

  5. Properties of interfaces in amorphous/crystalline silicon heterojunctions

    Energy Technology Data Exchange (ETDEWEB)

    Olibet, Sara; Vallat-Sauvain, Evelyne; Fesquet, Luc; Damon-Lacoste, Jerome; De Wolf, Stefaan; Ballif, Christophe [Ecole Polytechnique Federale de Lausanne (EPFL), IMT, Photovoltaics and Thin Film Electronics Laboratory, Breguet 2, 2000 Neuchatel (Switzerland); Monachon, Christian; Hessler-Wyser, Aicha [Ecole Polytechnique Federale de Lausanne (EPFL), Interdisciplinary Centre for Electron Microscopy (CIME), 1015 Lausanne (Switzerland)

    2010-03-15

    To study recombination at the amorphous/crystalline Si (a-Si:H/c-Si) heterointerface, the amphoteric nature of silicon (Si) dangling bonds is taken into account. Modeling interface recombination measured on various test structures provides insight into the microscopic passivation mechanisms, yielding an excellent interface defect density reduction by intrinsic a-Si:H and tunable field-effect passivation by doped layers. The potential of this model's applicability to recombination at other Si heterointerfaces is demonstrated. Solar cell properties of a-Si:H/c-Si heterojunctions are in good accordance with the microscopic interface properties revealed by modeling, that are, e.g., slight asymmetries in the neutral capture cross-sections and band offsets. The importance of atomically abrupt interfaces and the difficulties to obtain them on pyramidally textured c-Si is studied in combination with transmission electron microscopy. (Abstract Copyright [2010], Wiley Periodicals, Inc.)

  6. Si-H bond dynamics in hydrogenated amorphous silicon

    Science.gov (United States)

    Scharff, R. Jason; McGrane, Shawn D.

    2007-08-01

    The ultrafast structural dynamics of the Si-H bond in the rigid solvent environment of an amorphous silicon thin film is investigated using two-dimensional infrared four-wave mixing techniques. The two-dimensional infrared (2DIR) vibrational correlation spectrum resolves the homogeneous line shapes ( 4ps waiting times. The Si-H stretching mode anharmonic shift is determined to be 84cm-1 and decreases slightly with vibrational frequency. The 1→2 linewidth increases with vibrational frequency. Frequency dependent vibrational population times measured by transient grating spectroscopy are also reported. The narrow homogeneous line shape, large inhomogeneous broadening, and lack of spectral diffusion reported here present the ideal backdrop for using a 2DIR probe following electronic pumping to measure the transient structural dynamics implicated in the Staebler-Wronski degradation [Appl. Phys. Lett. 31, 292 (1977)] in a-Si:H based solar cells.

  7. Atomistic simulations of material damping in amorphous silicon nanoresonators

    Science.gov (United States)

    Mukherjee, Sankha; Song, Jun; Vengallatore, Srikar

    2016-06-01

    Atomistic simulations using molecular dynamics (MD) are emerging as a valuable tool for exploring dissipation and material damping in nanomechanical resonators. In this study, we used isothermal MD to simulate the dynamics of the longitudinal-mode oscillations of an amorphous silicon nanoresonator as a function of frequency (2 GHz–50 GHz) and temperature (15 K–300 K). Damping was characterized by computing the loss tangent with an estimated uncertainty of 7%. The dissipation spectrum displays a sharp peak at 50 K and a broad peak at around 160 K. Damping is a weak function of frequency at room temperature, and the loss tangent has a remarkably high value of ~0.01. In contrast, at low temperatures (15 K), the loss tangent increases monotonically from 4× {{10}-4} to 4× {{10}-3} as the frequency increases from 2 GHz to 50 GHz. The mechanisms of dissipation are discussed.

  8. Rapid Thermal annealing of silicon layers amorphized by ion implantation

    International Nuclear Information System (INIS)

    The recrystallization behavior and the supression mechanisms of the residual defects of silicon layers amorphized by ion implantation, were investigated. The samples were annealed with the aid of a rapid thermal annealing (RTA) system at temperature range from 850 to 12000C, and annealing time up to 120 s. Random and aligned Rutherford backscattering spectroscopy were used to analyse the samples. Similarities in the recrystallization behavior for layers implanted with ions of the same chemical groups such as As or Sb; Ge, Sn or Pb, In or Ga, are observed. The results show that the effective supression of resisual defects of the recrystallired layers is vinculated to the redistribution of impurities via thermal diffusion. (author)

  9. Preliminary modulation transfer function study on amorphous silicon

    International Nuclear Information System (INIS)

    Modulation Transfer Function, (MTF) is the scientific means of evaluating the fundamental spatial resolution performance of an imaging system. In the study, the modulation transfer function of an amorphous silicon (aSi) sensor array is measured by using Edge Spread Function (ESF) Technique which is extracting a profile from the linearised image of the sharp edge. The Platinum foil is used to determine the ESF. The detector under study was a 2,304 (h) x 3,200 (v) total pixel matrix, 127 μm2 pixel pitch, 57% fill factor and using Gd2O2S:Tb Kodak Lanex Regular as the conversion screen. The ESF measurement is done by using 75 - 100 kV range of x-ray with constant mA. (Author)

  10. Light-induced metastability in pure and hydrogenated amorphous silicon

    Science.gov (United States)

    Queen, D. R.; Liu, X.; Karel, J.; Wang, Q.; Crandall, R. S.; Metcalf, T. H.; Hellman, F.

    2015-10-01

    Light soaking is found to increase the specific heat C and internal friction Q-1 of pure (a-Si) and hydrogenated (a-Si:H) amorphous silicon. At the lowest temperatures, the increases in C and Q-1 are consistent with an increased density of two-level systems (TLS). The light-induced increase in C persists to room temperature. Neither the sound velocity nor shear modulus change with light soaking indicating that the Debye specific heat is unchanged which suggests that light soaking creates localized vibrational modes in addition to TLS. The increase can be reversibly added and removed by light soaking and annealing, respectively, suggesting that it is related to the Staebler-Wronski effect (SWE), even in a-Si without H, and involves a reversible nanoscale structural rearrangement that is facilitated by, but does not require, H to occur.

  11. Ion-beam-induced amorphous structures in silicon carbide

    International Nuclear Information System (INIS)

    Atomistic structure of ion-beam-induced amorphous silicon carbide (a-SiC) has been investigated by cross-sectional transmission electron microscopy. The electron intensities of halo patterns recorded on imaging plates were digitized quantitatively to extract reduced interference functions. We demonstrated the relationship between maximum scattering vector (Qmax) measured in scattering experiments and the resolution of the corresponding pair-distribution function by changing Qmax values from 160 to 230 nm-1. The results revealed that the C-C peak becomes broadened and eventually a shoulder as the Qmax value becomes shorter, indicating that Qmax values of -1 measured in previous studies are not enough to detect C-C homonuclear bonds in a-SiC. We are the first to reveal the existence of C-C and Si-Si homonuclear bonds in a-SiC using a diffraction technique

  12. Environmental aspects and risks of amorphous silicon solar cells

    International Nuclear Information System (INIS)

    The aim of the study on the title subject is to identify potential bottlenecks for a number of (future) solar cell technologies and to formulate ensuing recommendations with regard to the photovoltaic (PV) research and development policy in the Netherlands. The potential environmental effects of amorphous silicon PV modules are investigated for their entire life cycle. For the life cycle assessment (LCA) the product life cycle is divided into a number of processes, each of which is described by the typical product input and output flow, secondary materials input, energy input, process yield, emissions to water and air, solid waste production and the output of reusable (secondary) materials. Regarding the development towards future (energy) technologies three possible technology cases are defined: a worst, a base and a best case.In order to facilitate the material flow accounting for LCA, a special LCA computer model has been developed in connection with a data base system, containing process descriptions. Also attention is paid to possible risks concerning occupational health and safety. The overall conclusion is that, from am environmental and from a risk point of view, no serious bottlenecks can be identified in the life cycle of amorphous silicon PV modules. Within these constraints this technology can be called sustainable, when the present developments persevere and the available safety practices will be incorporated in the production processes to a large degree. Recommendations are given for further research on the title subject to fill gaps in the knowledge of parameters of certain processes for PV modules. 5 figs., 20 tabs., 2 appendices, 74 refs

  13. Solid phase epitaxy of amorphous silicon carbide: Ion fluence dependence

    International Nuclear Information System (INIS)

    We have investigated the effect of radiation damage and impurity concentration on solid phase epitaxial growth of amorphous silicon carbide (SiC) as well as microstructures of recrystallized layer using transmission electron microscopy. Single crystals of 6H-SiC with (0001) orientation were irradiated with 150 keV Xe ions to fluences of 1015 and 1016/cm2, followed by annealing at 890 deg. C. Full epitaxial recrystallization took place in a specimen implanted with 1015 Xe ions, while retardation of recrystallization was observed in a specimen implanted with 1016/cm2 Xe ions. Atomic pair-distribution function analyses and energy dispersive x-ray spectroscopy results suggested that the retardation of recrystallization of the 1016 Xe/cm2 implanted sample is attributed to the difference in amorphous structures between the 1015 and 1016 Xe/cm2 implanted samples, i.e., more chemically disordered atomistic structure and higher Xe impurity concentration in the 1016 Xe/cm2 implanted sample

  14. Characteristics of Disorder and Defect in Hydrogenated Amorphous Silicon Nitride Thin Films Containing Silicon Nanograins

    Institute of Scientific and Technical Information of China (English)

    DING Wen-ge; YU Wei; ZHANG Jiang-yong; HAN Li; FU Guang-sheng

    2006-01-01

    The hydrogenated amorphous silicon nitride (SiNx) thin films embedded with nano-structural silicon were prepared and the microstructures at the interface of silicon nano-grains/SiNx were identified by the optical absorption and Raman scattering measurements. Characterized by the exponential tail of optical absorption and the band-width of the Raman scattering TO mode, the disorder in the interface region increases with the gas flow ratio increasing. Besides, as reflected by the sub-gap absorption coefficients, the density of interface defect states decreases, which can be attributed to the structural mismatch in the interface region and also the changes of hydrogen content in the deposited films. Additional annealing treatment results in a significant increase of defects and degree of disorder, for which the hydrogen out-diffusion in the annealing process would be responsible.

  15. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Science.gov (United States)

    Abdulraheem, Yaser; Gordon, Ivan; Bearda, Twan; Meddeb, Hosny; Poortmans, Jozef

    2014-05-01

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties -including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc) bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause of the observed

  16. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Directory of Open Access Journals (Sweden)

    Yaser Abdulraheem

    2014-05-01

    Full Text Available An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si wafers by plasma enhanced chemical vapor deposition (PECVD. The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause

  17. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    International Nuclear Information System (INIS)

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc) bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause of the observed

  18. Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

    Energy Technology Data Exchange (ETDEWEB)

    Abdulraheem, Yaser, E-mail: yaser.abdulraheem@kuniv.edu.kw [Electrical Engineering Department, College of Engineering and Petroleum, Kuwait University. P.O. Box 5969, 13060 Safat (Kuwait); Gordon, Ivan; Bearda, Twan; Meddeb, Hosny; Poortmans, Jozef [IMEC, Kapeldreef 75, 3001, Leuven (Belgium)

    2014-05-15

    An optical study based on spectroscopic ellipsometry, performed on ultrathin hydrogenated amorphous silicon (a-Si:H) layers, is presented in this work. Ultrathin layers of intrinsic amorphous silicon have been deposited on n-type mono-crystalline silicon (c-Si) wafers by plasma enhanced chemical vapor deposition (PECVD). The layer thicknesses along with their optical properties –including their refractive index and optical loss- were characterized by spectroscopic ellipsometry (SE) in a wavelength range from 250 nm to 850 nm. The data was fitted to a Tauc-Lorentz optical model and the fitting parameters were extracted and used to compute the refractive index, extinction coefficient and optical bandgap. Furthermore, the a-Si:H film grown on silicon was etched at a controlled rate using a TMAH solution prepared at room temperature. The optical properties along with the Tauc-Lorentz fitting parameters were extracted from the model as the film thickness was reduced. The etch rate for ultrathin a-Si:H layers in TMAH at room temperature was found to slow down drastically as the c-Si interface is approached. From the Tauc-Lorentz parameters obtained from SE, it was found that the a-Si film exhibited properties that evolved with thickness suggesting that the deposited film is non-homogeneous across its depth. It was also found that the degree of crystallinity and optical (Tauc) bandgap increased as the layers were reduced in thickness and coming closer to the c-Si substrate interface, suggesting the presence of nano-structured clusters mixed into the amorphous phase for the region close to the crystalline silicon substrate. Further results from Atomic Force Microscopy and Transmission Electron Microscopy confirmed the presence of an interfacial transitional layer between the amorphous film and the underlying substrate showing silicon nano-crystalline enclosures that can lead to quantum confinement effects. Quantum confinement is suggested to be the cause of the observed

  19. Low temperature irradiation effects on iron boron based amorphous metallic alloys

    International Nuclear Information System (INIS)

    Three Fe-B amorphous alloys (Fe80B20, Fe27Mo2B20 and Fe75B25) and the crystallized Fe3B alloy have been irradiated at the temperature of liquid hydrogen. Electron irradiation and irradiation by 10B fission fragments induce point defects in amorphous alloys. These defects are characterized by an intrinsic resistivity and a formation volume. The threshold energy for the displacement of iron atoms has also been calculated. Irradiation by 235U fission fragments induces some important structural modifications in the amorphous alloys

  20. Formation and thermal stability of amorphous Ni-Mo-P alloys

    Institute of Scientific and Technical Information of China (English)

    ZHANG Yi; MA Jun; FANG Yong-kui; DUAN Ji-guo

    2004-01-01

    The experimental researches on the chemical deposition of Ni-Mo-P amorphous alloys were carried out by adding Na2 MoO4 into acidic solutions. The optimum technology conditions were obtained by orthogonal design experiments. The structures and the relationship between compositions and their thermal stability were studied by energy spectrum (EC), scanning electron micrograph and X-ray diffraction spectrum. Compared with Ni-P amorphous alloys, the Ni-Mo-P amorphous alloys have high crystallization temperature and thermal stability, and the hardness reaches its peak when the annealing temperature is 500 ℃. With the increase of the heat treatment temperature, the surface morphology of the alloys changes.

  1. Excellent crystalline silicon surface passivation by amorphous silicon irrespective of the technique used for chemical vapor deposition

    OpenAIRE

    Schuttauf, J.A.; van der Werf, C.H.M.; Kielen, I.M.; Sark, W.G.J.H.M. van; Rath, J.K.; R. E. I. Schropp

    2011-01-01

    Crystalline silicon surface passivation by amorphous silicon deposited by three different chemical vapor deposition (CVD) techniques at low (T ∼ 130 °C) temperatures is compared. For all three techniques, surface recombination velocities (SRVs) are reduced by two orders of magnitude after prolonged thermal annealing at 200 °C. This reduction correlates with a decreased dangling bond density at the amorphous-crystalline interface, indicating that dangling bond saturation is the predominant mec...

  2. Electronic properties of intrinsic and doped amorphous silicon carbide films

    Energy Technology Data Exchange (ETDEWEB)

    Vetter, M. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain)]. E-mail: mvetter@eel.upc.edu; Voz, C. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Ferre, R. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Martin, I. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Orpella, A. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Puigdollers, J. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain); Andreu, J. [Departament de Fisica Aplicada i Optica, Universitat de Barcelona, Av. Diagonal 647, E-08028 Barcelona (Spain); Alcubilla, R. [Departament d' Enginyeria Electronica, Universitat Politecnica de Catalunya, Gran Capita s/n, Modul C4, E-08034 Barcelona (Spain)

    2006-07-26

    Hydrogenated amorphous silicon carbide (a-SiC{sub x} : H) films have shown excellent surface passivation of crystalline silicon. With the aim of large area deposition of these films the influence of the rf plasma power was investigated. It is found that homogenous deposition with effective surface recombination velocity lower than 100 cms{sup -1} is possible up to 6'' diameter in a simple parallel plate reactor by optimizing deposition parameters. For application in solar cell processes the conductivity of these a-SiC{sub x} : H films might become of importance since good surface passivation results from field-effect passivation which needs an insulating dielectric layer. Therefore, the temperature dependence of the dark dc conductivity of these films was investigated in the temperature range from - 20 to 260 deg. C. Two transition temperatures, T {sub s}{approx}80 deg. C and T {sub s}{approx}170 deg. C, were found where conductivity increases, resp. decreases over-exponential. From Arrhenius plots activation energy (E {sub a}) and conductivity pre-factor ({sigma} {sub 0}) were calculated for a large number of samples with different composition. A correlation between E {sub a} and {sigma} {sub 0} was found giving a Meyer-Neldel relation with a slope of 59 mV, corresponding to a material characteristic temperature T {sub m} = 400 deg. C, and an intercept at {sigma} {sub 00} = 0.1 {omega}{sup -1}cm{sup -1}.

  3. Electronic properties of intrinsic and doped amorphous silicon carbide films

    International Nuclear Information System (INIS)

    Hydrogenated amorphous silicon carbide (a-SiCx : H) films have shown excellent surface passivation of crystalline silicon. With the aim of large area deposition of these films the influence of the rf plasma power was investigated. It is found that homogenous deposition with effective surface recombination velocity lower than 100 cms-1 is possible up to 6'' diameter in a simple parallel plate reactor by optimizing deposition parameters. For application in solar cell processes the conductivity of these a-SiCx : H films might become of importance since good surface passivation results from field-effect passivation which needs an insulating dielectric layer. Therefore, the temperature dependence of the dark dc conductivity of these films was investigated in the temperature range from - 20 to 260 deg. C. Two transition temperatures, T s∼80 deg. C and T s∼170 deg. C, were found where conductivity increases, resp. decreases over-exponential. From Arrhenius plots activation energy (E a) and conductivity pre-factor (σ 0) were calculated for a large number of samples with different composition. A correlation between E a and σ 0 was found giving a Meyer-Neldel relation with a slope of 59 mV, corresponding to a material characteristic temperature T m = 400 deg. C, and an intercept at σ 00 = 0.1 Ω-1cm-1

  4. Direct measurement of free-energy barrier to nucleation of crystallites in amorphous silicon thin films

    Science.gov (United States)

    Shi, Frank G.

    1994-01-01

    A method is introduced to measure the free-energy barrier W(sup *), the activation energy, and activation entropy to nucleation of crystallites in amorphous solids, independent of the energy barrier to growth. The method allows one to determine the temperature dependence of W(sup *), and the effect of the preparation conditions of the initial amorphous phase, the dopants, and the crystallization methds on W(sup *). The method is applied to determine the free-energy barrier to nucleation of crystallites in amorphous silicon (a-Si) thin films. For thermally induced nucleation in a-Si thin films with annealing temperatures in the range of from 824 to 983 K, the free-energy barrier W(sup *) to nucleation of silicon crystals is about 2.0 - 2.1 eV regardless of the preparation conditions of the films. The observation supports the idea that a-Si transforms into an intermediate amorphous state through the structural relaxation prior to the onset of nucleation of crystallites in a-Si. The observation also indicates that the activation entropy may be an insignificant part of the free-energy barrier for the nucleation of crystallites in a-Si. Compared with the free-energy barrier to nucleation of crystallites in undoped a-Si films, a significant reduction is observed in the free-energy barrier to nucleation in Cu-doped a-Si films. For a-Si under irradiation of Xe(2+) at 10(exp 5) eV, the free-energy barrier to ion-induced nucleation of crystallites is shown to be about half of the value associated with thermal-induced nucleation of crystallites in a-Si under the otherwise same conditions, which is much more significant than previously expected. The present method has a general kinetic basis; it thus should be equally applicable to nucleation of crystallites in any amorphous elemental semiconductors and semiconductor alloys, metallic and polymeric glasses, and to nucleation of crystallites in melts and solutions.

  5. Pulsed Excimer (KrF) Laser Melting of Amorphous and Crystalline Silicon Layers

    OpenAIRE

    Walthuis, A.; Stritzker, B.; White, C. W.; J. Narayan; Aziz, Michael

    1985-01-01

    We have investigated depth of melting as a function of pulse energy density in amorphous and crystalline silicon layers. The melting threshold for KrF laser pulses (lambda=0.249 µm, tau=24×10−9 s) in amorphous (7660-Å-thick) and crystalline silicon layers were determined to be 0.16±0.02 and 0.75±0.05 J cm−2, respectively. The formation of fine- and large-polycrystalline regions was clearly identified in the amorphous silicon layers for energy densities below that needed for complete annealing...

  6. Temperature dependence of hydrogenated amorphous silicon solar cell performances

    Science.gov (United States)

    Riesen, Y.; Stuckelberger, M.; Haug, F.-J.; Ballif, C.; Wyrsch, N.

    2016-01-01

    Thin-film hydrogenated amorphous silicon solar (a-Si:H) cells are known to have better temperature coefficients than crystalline silicon cells. To investigate whether a-Si:H cells that are optimized for standard conditions (STC) also have the highest energy yield, we measured the temperature and irradiance dependence of the maximum power output (Pmpp), the fill factor (FF), the short-circuit current density (Jsc), and the open-circuit voltage (Voc) for four series of cells fabricated with different deposition conditions. The parameters varied during plasma-enhanced chemical vapor deposition (PE-CVD) were the power and frequency of the PE-CVD generator, the hydrogen-to-silane dilution during deposition of the intrinsic absorber layer (i-layer), and the thicknesses of the a-Si:H i-layer and p-type hydrogenated amorphous silicon carbide layer. The results show that the temperature coefficient of the Voc generally varies linearly with the Voc value. The Jsc increases linearly with temperature mainly due to temperature-induced bandgap reduction and reduced recombination. The FF temperature dependence is not linear and reaches a maximum at temperatures between 15 °C and 80 °C. Numerical simulations show that this behavior is due to a more positive space-charge induced by the photogenerated holes in the p-layer and to a recombination decrease with temperature. Due to the FF(T) behavior, the Pmpp (T) curves also have a maximum, but at a lower temperature. Moreover, for most series, the cells with the highest power output at STC also have the best energy yield. However, the Pmpp (T) curves of two cells with different i-layer thicknesses cross each other in the operating cell temperature range, indicating that the cell with the highest power output could, for instance, have a lower energy yield than the other cell. A simple energy-yield simulation for the light-soaked and annealed states shows that for Neuchâtel (Switzerland) the best cell at STC also has the best energy

  7. Nano structures of amorphous silicon: localization and energy gap

    Directory of Open Access Journals (Sweden)

    Z Nourbakhsh

    2013-10-01

    Full Text Available Renewable energy research has created a push for new materials; one of the most attractive material in this field is quantum confined hybrid silicon nano-structures (nc-Si:H embedded in hydrogenated amorphous silicon (a-Si:H. The essential step for this investigation is studying a-Si and its ability to produce quantum confinement (QC in nc-Si: H. Increasing the gap of a-Si system causes solar cell efficiency to increase. By computational calculations based on Density Functional Theory (DFT, we calculated a special localization factor, [G Allan et al., Phys. Rev. B 57 (1997 6933.], for the states close to HOMO and LUMO in a-Si, and found most weak-bond Si atoms. By removing these silicon atoms and passivating the system with hydrogen, we were able to increase the gap in the a-Si system. As more than 8% hydrogenate was not experimentally available, we removed about 2% of the most localized Si atoms in the almost tetrahedral a-Si system. After removing localized Si atoms in the system with 1000 Si atoms, and adding 8% H, the gap increased about 0.24 eV. Variation of the gap as a function of hydrogen percentage was in good agreement with the Tight –Binding results, but about 2 times more than its experimental value. This might come from the fact that in the experimental conditions, it does not have the chance to remove the most localized states. However, by improving the experimental conditions and technology, this value can be improved.

  8. Short range ordering and microstructure property relationship in amorphous alloys

    Energy Technology Data Exchange (ETDEWEB)

    Shariq, A.

    2006-07-01

    A novel algorithm, ''Next Neighbourhood Evaluation (NNE)'', is enunciated during the course of this work, to elucidate the next neighbourhood atomic vicinity from the data, analysed using tomographic atom probe (TAP) that allows specifying atom positions and chemical identities of the next neighbouring atoms for multicomponent amorphous materials in real space. The NNE of the Pd{sub 55}Cu{sub 23}P{sub 22} bulk amorphous alloy reveals that the Pd atoms have the highest probability to be the next neighbours to each other. Moreover, P-P correlation corroborates earlier investigations with scattering techniques that P is not a direct next neighbour to another P atom. Analogous investigations on the Fe{sub 40}Ni{sub 40}B{sub 20} metallic glass ribbons, in the as quenched state and for a state heat treated at 350 C for 1 hour insinuate a pronounced elemental inhomogeneity for the annealed state, though, it also depicts glimpse of a slight inhomogeneity for B distribution even for the as quenched sample. Moreover, a comprehensive microstructural investigation has been carried out on the Zr{sub 53}Co{sub 23.5}Al{sub 23.5} glassy system. TEM and TAP investigations evince that the as cast bulk samples constitutes a composite structure of an amorphous phase and crystalline phase(s). The crystallization is essentially triggered at the mould walls due to heterogeneous nucleation. The three dimensional atomic reconstruction maps of the volume analysed by TAP reveal a complex stereological interconnected network of two phases. The phase that is rich in Zr and Al concentration is depleted in Co concentration while the phase that is rich in Co concentration is depleted both in Zr and Al. Zr{sub 53}Co{sub 23.5}Al{sub 23.5} glassy splat samples exhibit a single exothermic crystallization peak contrary to the as cast bulk sample with a different T{sub g} temperature. A single homogeneous amorphous phase revealed by TEM investigations depicts that the faster cooling

  9. Analysis of IV characteristics of solar cells made of hydrogenated amorphous, polymorphous and microcrystalline silicon

    International Nuclear Information System (INIS)

    The IV characteristics of pin solar cells made of amorphous, polymorphous and microcrystalline silicon were investigated. The temperature dependence was measured in the temperature range between 150 K and 395 K. This range covers the most terrestrial applications condition. Using simplex procedure, the IV parameter of the cells were deduce using line fitting. It has been shown that polymorphous silicon shows electrical properties that are close to properties of microcrystalline silicon but as it is well known, polymorphous silicon shows higher absorption similar to amorphous silicon. The polymorphous silicon solar cells showed higher efficiencies, lower shunting and higher filling factors. In the above mentioned temperature range, polymorphous silicon is the better material for the manufacturing of thin film hydrogenated silicon pin solar cells. More investigations concerning the structural properties are necessary to make stronger conclusions in regards to the stability of the material, what we hope to do in the future. (author)

  10. Unexpected magnetic behavior in amorphous Co{sub 90}Sc{sub 10} alloy

    Energy Technology Data Exchange (ETDEWEB)

    Ghafari, M., E-mail: mohammad.ghafari@kit.edu, E-mail: skamali@utsi.edu; Gleiter, H. [Herbert Gleiter Institute of Nanoscience, Nanjing University of Science and Technology, Nanjing 210094 (China); Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen (Germany); Sakurai, Y.; Itou, M. [Japan Synchrotron Radiation Research Institute (JASRI), SPring-8, 1-1-1 Kouto, Sayo, Sayo, Hyogo (Japan); Peng, G.; Fang, Y. N.; Feng, T. [Herbert Gleiter Institute of Nanoscience, Nanjing University of Science and Technology, Nanjing 210094 (China); Hahn, H. [Herbert Gleiter Institute of Nanoscience, Nanjing University of Science and Technology, Nanjing 210094 (China); Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), 76344 Eggenstein-Leopoldshafen (Germany); KIT-TUD Joint Research Laboratory Nanomaterials, Institute of Materials Science, Technische Universität Darmstadt (TUD), Jovanka-Bontschits-Str. 2, 64287 Darmstadt (Germany); Kamali, S., E-mail: mohammad.ghafari@kit.edu, E-mail: skamali@utsi.edu [Department of Mechanical, Aerospace and Biomedical Engineering, University of Tennessee Space Institute, Tullahoma, Tennessee 37388 (United States)

    2015-09-28

    An amorphous alloy Co{sub 90}Sc{sub 10} has been prepared by rapid quenching from the melt. The results of magnetization measurements show that this alloy has the highest Curie temperature reported for any amorphous transition metal based alloys. Furthermore, for a Co based amorphous alloy, the magnetic moment is remarkably high. Moreover, the alloy exhibits soft magnetic properties. Based on the findings, amorphous Co{sub 90}Sc{sub 10} appears to be an attractive candidate for applications as a soft magnetic material. The temperature dependence of the reduced magnetization can be described by the Bloch power law. The results show that the B coefficient of the amorphous Co{sub 90}Sc{sub 10} alloy, which is a measure of the rigidity of spin waves, exhibits the lowest value observed until now for any amorphous alloy and is comparable to crystalline alloys. It is found that the Sc atoms in the Co{sub 90}Sc{sub 10} alloy lead to an increase of the itinerant spin moment of Co atoms, and, in contrast to this behaviour, to a decrease of the local 3d-electrons of Co.

  11. Growth of crystalline silicon nanowires on nickel-coated silicon wafer beneath sputtered amorphous carbon

    International Nuclear Information System (INIS)

    Growth of crystalline silicon nanowire of controllable diameter directly from Si wafer opens up another avenue for its application in solar cells and optical sensing. Crystalline Si nanowire can be directly grown from Si wafer upon rapid thermal annealing in the presence of the catalyst such as nickel (Ni). However, the accompanying oxidation immediately changes the crystalline Si nanowire to amorphous SiOx. In this study, amorphous carbon layer was sputtered to on top of the catalyst Ni layer to retard the oxidation. Scanning electron microscope, transmission electron microscope, Raman spectroscopy and X-ray photoelectron spectroscopy were employed to characterize the wires and oxidation process. A model was developed to explain the growth and oxidation process of the crystalline Si nanowire. - Highlights: ► Carbon was sputtered on nickel to retard the oxidation of silicon nanowires. ► Silicon core was controlled by carbon layer thickness and annealing duration. ► An oxidation-accompanying solid–liquid–solid growth mechanism was developed

  12. 非晶硅锗电池性能的调控研究%Modification to the performance of hydrogenated amorphous silicon germanium thin film solar cell

    Institute of Scientific and Technical Information of China (English)

    刘伯飞; 白立沙; 魏长春; 孙建; 侯国付; 赵颖; 张晓丹

    2013-01-01

    采用射频等离子体增强化学气相沉积技术,研究了非晶硅锗薄膜太阳电池。针对非晶硅锗薄膜材料的本身特性,通过调控硅锗合金中硅锗的比例,实现了对硅锗薄膜太阳电池中开路电压和短路电流密度的分别控制。借助于本征层硅锗材料帯隙梯度的设计,获得了可有效用于多结叠层电池中的非晶硅锗电池。%In this paper, we study hydrogenated amorphous silicon germanium thin film solar cells prepared by the radio frequency plasma-enhanced chemical vapor deposition. In the light of the inherent characteristics of hydrogenated amorphous silicon germanium mate-rial, the modulation of the germanium/silicon ratio in silicon germanium alloys can separately control open circuit voltage (Voc) and short circuit current density (Jsc) of a-SiGe:H thin film solar cells. By the structural design of band gap profiling in the amorphous silicon germanium intrinsic layer, hydrogenated amorphous silicon germanium thin film solar cells, which can be used efficiently as the component cell of multi-junction solar cells, are obtained.

  13. Controlled growth of nanocrystalline silicon within amorphous silicon carbide thin films

    Science.gov (United States)

    Kole, Arindam; Chaudhuri, Partha

    2014-04-01

    Controlled formation of nanocrystalline silicon (nc-Si) within hydrogenated amorphous silicon carbide (a-SiC:H) thin films has been demonstrated by a rf (13.56 MHz) plasma chemical vapour deposition (PECVD) method at a low deposition temperature of 200°C by regulating the deposition pressure (Pr) between 26.7 Pa and 133.3 Pa. Evolution of the size and the crystalline silicon volume fraction within the a-SiC:H matrix has been studied by XRD, Raman and HRTEM. The study reveals that at Pr of 26.7 Pa there are mostly isolated grains of nc-Si within the a-SiC:H matrix with average size of 4.5 nm. With increase of Pr the isolated nc-Si grains coalesce more and more giving rise to larger size connected nc-Si islands which appear as microcrystalline silicon in the Raman spectra. As a result net isolated nc-Si volume fraction decreases while the total crystalline silicon volume fraction increases.

  14. Low-Temperature Annealing Induced Amorphization in Nanocrystalline NiW Alloy Films

    Directory of Open Access Journals (Sweden)

    Z. Q. Chen

    2013-01-01

    Full Text Available Annealing induced amorphization in sputtered glass-forming thin films was generally observed in the supercooled liquid region. Based on X-ray diffraction and transmission electron microscope (TEM analysis, however, here, we demonstrate that nearly full amorphization could occur in nanocrystalline (NC sputtered NiW alloy films annealed at relatively low temperature. Whilst the supersaturation of W content caused by the formation of Ni4W phase played a crucial role in the amorphization process of NiW alloy films annealed at 473 K for 30 min, nearly full amorphization occurred upon further annealing of the film for 60 min. The redistribution of free volume from amorphous regions into crystalline regions was proposed as the possible mechanism underlying the nearly full amorphization observed in NiW alloys.

  15. Fabrication of solution-processed hydrogenated amorphous silicon single junction solar cells

    OpenAIRE

    Masuda, Takashi; Sotani, Naoya; Hamada, Hiroki; Matsuki, Yasuo; Shimoda, Tatsuya

    2012-01-01

    Hydrogenated amorphous silicon solar cells were fabricated using solution-based processes. All silicon layers of the p-i-n junction were stacked by a spin-cast method using doped and non-doped polydihydrosilane solutions. Further, a hydrogen-radical treatment under vacuum conditions was employed to reduce spin density in the silicon films. Following this treatment, the electric properties of the silicon films were improved, and the power conversion efficiency of the solar cells was also incre...

  16. Excellent crystalline silicon surface passivation by amorphous silicon irrespective of the technique used for chemical vapor deposition

    NARCIS (Netherlands)

    Schuttauf, J.A.; van der Werf, C.H.M.; Kielen, I.M.; van Sark, W.G.J.H.M.; Rath, J.K.; Schropp, R.E.I.

    2011-01-01

    Crystalline silicon surface passivation by amorphous silicon deposited by three different chemical vapor deposition (CVD) techniques at low (T ∼ 130 °C) temperatures is compared. For all three techniques, surface recombination velocities (SRVs) are reduced by two orders of magnitude after prolonged

  17. Temperature-dependent minority carrier lifetime of crystalline silicon wafers passivated by high quality amorphous silicon oxide

    Science.gov (United States)

    Inaba, Masahiro; Todoroki, Soichiro; Nakada, Kazuyoshi; Miyajima, Shinsuke

    2016-04-01

    We investigated the effects of annealing on the temperature-dependent minority carrier lifetime of a crystalline silicon wafer passivated by hydrogenated amorphous silicon oxide. The annealing significantly affects the lifetime and its temperature dependence. Our device simulations clearly indicate that valence band offset significantly affects the temperature dependence. We also found a slight increase in the interface defect density after annealing.

  18. Nonlinear Optical Functions in Crystalline and Amorphous Silicon-on-Insulator Nanowires

    DEFF Research Database (Denmark)

    Baets, R.; Kuyken, B.; Liu, X.;

    2012-01-01

    Silicon-on-Insulator nanowires provide an excellent platform for nonlinear optical functions in spite of the two-photon absorption at telecom wavelengths. Work on both crystalline and amorphous silicon nanowires is reviewed, in the wavelength range of 1.5 to 2.5 µm.......Silicon-on-Insulator nanowires provide an excellent platform for nonlinear optical functions in spite of the two-photon absorption at telecom wavelengths. Work on both crystalline and amorphous silicon nanowires is reviewed, in the wavelength range of 1.5 to 2.5 µm....

  19. RF sputtering for controlling dihydride and monohydride bond densities in amorphous silicon hydride

    Science.gov (United States)

    Jeffery, F.R.; Shanks, H.R.

    1980-08-26

    A process is described for controlling the dihydride and monohydride bond densities in hydrogenated amorphous silicone produced by reactive rf sputtering of an amorphous silicon target. There is provided a chamber with an amorphous silicon target and a substrate therein with the substrate and the target positioned such that when rf power is applied to the target the substrate is in contact with the sputtering plasma produced thereby. Hydrogen and argon are fed to the chamber and the pressure is reduced in the chamber to a value sufficient to maintain a sputtering plasma therein, and then rf power is applied to the silicon target to provide a power density in the range of from about 7 watts per square inch to about 22 watts per square inch to sputter an amorphous solicone hydride onto the substrate, the dihydride bond density decreasing with an increase in the rf power density. Substantially pure monohydride films may be produced.

  20. Anomalous interaction of longitudinal electric field with hydrogenated amorphous silicon films

    OpenAIRE

    Zhang, J.; Gecevičius, M.; Beresna, M; Kazanskii, A.G.; Kazansky, P. G.

    2013-01-01

    Cylindrically polarized beams produced by femtosecond laser written S-waveplate are used to modify amorphous silicon films. Paradoxically, no crystallization is observed in the maximum of longitudinal electric field despite the strongest light intensity

  1. Accuracy and long-term stability of amorphous-silicon measurements

    Science.gov (United States)

    Mueller, R.

    1986-01-01

    The measurement system requirements to obtain accurate electrical performance measurements of amorphous silicon cells and modules were described. The progress achieved in modifying the Jet Propulsion Laboratory (JPL) system toward that objective were reviewed.

  2. Structural and electrical properties of metastable defects in hydrogenated amorphous silicon

    NARCIS (Netherlands)

    Melskens, J.; Schnegg, A.; Baldansuren, A.; Lips, K.; Plokker, M.P.; Eijt, S.W.H.; Schut, H.; Fischer, M.; Zeman, M.; Smets, A.H.M.

    2015-01-01

    The structural and electrical properties of metastable defects in various types of hydrogenated amorphous silicon have been studied using a powerful combination of continuous wave electron-paramagnetic resonance spectroscopy, electron spin echo (ESE) decay measurements, and Doppler broadening positr

  3. Solution growth of microcrystalline silicon on amorphous substrates

    Energy Technology Data Exchange (ETDEWEB)

    Heimburger, Robert

    2010-07-05

    This work deals with low-temperature solution growth of micro-crystalline silicon on glass. The task is motivated by the application in low-cost solar cells. As glass is an amorphous material, conventional epitaxy is not applicable. Therefore, growth is conducted in a two-step process. The first step aims at the spatial arrangement of silicon seed crystals on conductive coated glass substrates, which is realized by means of vapor-liquid-solid processing using indium as the solvent. Seed crystals are afterwards enlarged by applying a specially developed steady-state solution growth apparatus. This laboratory prototype mainly consists of a vertical stack of a silicon feeding source and the solvent (indium). The growth substrate can be dipped into the solution from the top. The system can be heated to a temperature below the softening point of the utilized glass substrate. A temperature gradient between feeding source and growth substrate promotes both, supersaturation and material transport by solvent convection. This setup offers advantages over conventional liquid phase epitaxy at low temperatures in terms of achievable layer thickness and required growth times. The need for convective solute transport to gain the desired thickness of at least 50 {mu}m is emphasized by equilibrium calculations in the binary system indium-silicon. Material transport and supersaturation conditions inside the utilized solution growth crucible are analyzed. It results that the solute can be transported from the lower feeding source to the growth substrate by applying an appropriate heating regime. These findings are interpreted by means of a hydrodynamic analysis of fluid flow and supporting FEM simulation. To ensure thermodynamic stability of all materials involved during steady-state solution growth, the ternary phase equilibrium between molybdenum, indium and silicon at 600 C was considered. Based on the obtained results, the use of molybdenum disilicide as conductive coating

  4. Formation and crystallization of bulk Pd82Si18 amorphous alloys

    Institute of Scientific and Technical Information of China (English)

    蒲建; 王敬丰; 肖建中; 崔昆

    2003-01-01

    Bulk amorphous Pd82Si18 alloy with the largest diameter of 8 mm was prepared by water quenching the molten alloy with flux medium in a quartz tube. The calculation result indicates that the bulk Pd82Si18 amorphous alloys have a low critical cooling rate (Rc) of 4.589 K/s or less. The experimental results show that purifying melt may improve glass forming ability(GFA) of undercooled melt, while liquid phase separation (LPS) of undercooled melt will decrease its GFA. There are some differences in crystallization experiments between bulk metallic glass and amorphous ribbons of Pd82Si18 alloys. These include the numbers of exothermic peak, glass transition temperature Tg, crystallization temperature Tx, region of undercooling liquid (ΔT=Tx-Tg) respectively. The links of cooling rates of melt and crystallization of Pd82Si18 amorphous alloys are explored.

  5. The preparation of well-dispersed Ni-B amorphous alloy nanoparticles at room temperature

    Energy Technology Data Exchange (ETDEWEB)

    Wen Ming [Department of Chemistry, Tongji University, Shanghai 200092 (China)], E-mail: m_wen@mail.tongji.edu.cn; Li Lujiang; Liu Qiuyan; Qi Haiquan [Department of Chemistry, Tongji University, Shanghai 200092 (China); Zhang Tao [Department of Materials Science and Engineering, Beijing University of Aeronaut and Astronaut, Beijing 100083 (China)

    2008-05-08

    The air-stable well-dispersed Ni-B amorphous alloy nanoparticles in the similar size of 5 nm with narrow deviation were prepared by a chemical solution alloying process at room temperature in a positive microemulsion system. The proposed interface reaction mechanism, element analysis and thermal stability as well as the magnetic behavior of Ni-B amorphous alloy nanoparticles were characterized by X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), transmission electron microscopy (TEM), infrared spectroscopy (IR), differential scanning calorimetry (DSC) and vibrating sample magnetometer (VSM). All the results showed that as synthesized Ni-B amorphous alloy nanoparticles are air-stable in room temperature and coated by macromolecular compound oleic acid. The magnetic property of the as synthesized Ni-B amorphous alloy was discussed based on the obtained results.

  6. Neutron scattering studies of hydrogenated, deuterated and fluorinated amorphous silicon

    International Nuclear Information System (INIS)

    A comprehensive neutron scattering study has been performed of hydrogenated (Si0.78H0.22), deuterated (Si0.77D0.23) and partially fluorinated deuterated (Si0.725D0.120F0.155) amorphous silicon, prepared by the glow-discharge technique. The measurements performed include diffraction, small-angle neutron scattering (SANS) and inelastic neutron scattering, and the data obtained are discussed in terms of various structural models in the literature. The real-space correlation function for Si0.77D0.23 exhibits sharp peaks at 1.49 and 2.36 A, due to Si-D and Si-Si covalent bonds, respectively, while peaks centred at 3.2 and 3.8 A are due to Si-D and Si-Si second-neighbour distances. High-energy resolution inelastic scattering measurements for Si0.78H0.22 show that there are approximately equal numbers of ≡SiH and = SiH2 groupings, there being no indication of excitations corresponding to -SiH3 groupings. The presence of molecular hydrogen is demonstrated unambiguously by the observation of the ortho-to-para conversion, via molecular rotation modes at 14.5 and 29.4 meV. The shift in the Si-H stretch modes introduced by deuteration is slightly less than the value of √2 expected for free hydrogen, indicating a small but observable influence of the amorphous silicon matrix. The size of the cages containing the H2 molecules has been investigated via SANS, which yields a mean Guinier radius of ∼5-6 A. In addition, the use of the H-D SANS contrast technique indicates that each cage contains on average about 60 H2 (D2) molecules. The data for the Si0.725D0.120F0.155 sample are consistent with a previously suggested model of network cages predominantly containing molecular SiF4

  7. Density of states in Mo-Ru amorphous alloys

    International Nuclear Information System (INIS)

    The density of states is calculated for several compositions of amorphous Mo1-x Rux. In order to simulate amorphous clusters, the structures (atomic positions) utilized in the calculations were built from a small dense randomly packed unit of hard spheres with periodic boundary conditions. The density of states is calculated from a tight-binding Hamiltonian with hopping integrals parametrized in terms of the ddσ, ddΠ and ddδ molecular integrals. The results for pure Mo and pure Ru, compared in the canonical band aproximation, agree well with the literature. For binary alloys, the comparison of the calculated density of states with the rigid band aproximation results indicates that a more complex approach than the rigid band model must be used, even when the two atoms have similar bands, with band centers at nearly the same energy. The results also indicate that there is no relation between the peak in the superconducting critical temperature as a function of the number of valence eletrons per atom (e/a) in the region near Mo(e/a=6) and the peak of the density of states at the Fermi level in the same region, as has been sugested by some authors. (Author)

  8. Label-Free Direct Electronic Detection of Biomolecules with Amorphous Silicon Nanostructures

    OpenAIRE

    Lund, John; Mehta, Ranjana; Parviz, Babak A.

    2006-01-01

    We present the fabrication and characterization of a nano-scale sensor made of amorphous silicon for the label-free, electronic detection of three classes of biologically important molecules: ions, oligonucleotides, and proteins. The sensor structure has an active element which is a 50 nm wide amorphous silicon semicircle and has a total footprint of less than 4 μm2. We demonstrate the functionalization of the sensor with receptor molecules and the electronic detection of three targets: H+ io...

  9. Modeling the Crystallization of Amorphous Silicon Thin Films Using a High Repetition Rate Scanning Laser

    OpenAIRE

    Černý, R.; A. Kalbáč

    2000-01-01

    An optimum design of experimental setup for the preparation of polycrystalline silicon (pc-Si) films from amorphous layers applicable in the solar cell production is analyzed in the paper. In the computational simulations, the influence of basic characteristic parameters of the experimental procedure on the mechanisms of pc-Si lateral growth is studied. Among these parameters, the energy density of the applied laser and the thickness of the amorphous silicon (a-Si) layer are identified ...

  10. Optical determination of the mass density of amorphous and microcrystalline silicon layers with different hydrogen contents

    OpenAIRE

    Remeš, Z.; Vaněček, Milan; Torres, Pedro; Kroll, U.; Mahan, A. H.; Crandall, R. S.

    2008-01-01

    We have measured the density of amorphous and microcrystalline silicon films using an optical method. The mass density decreases with increasing hydrogen content, consistent with a hydrogenated di-vacancy model that fits the data for amorphous silicon. Material produced by hot wire assisted chemical vapour deposition, with low hydrogen content, has a higher density and is structurally different from glow discharge material with hydrogen content around 10 at.%. The lower density microcrystalli...

  11. Electronic Structure of Dangling Bonds in Amorphous Silicon Studied via a Density-Matrix Functional Method

    OpenAIRE

    Hennig, R. G.; Fedders, P. A.; Carlsson, A. E.

    2002-01-01

    A structural model of hydrogenated amorphous silicon containing an isolated dangling bond is used to investigate the effects of electron interactions on the electronic level splittings, localization of charge and spin, and fluctuations in charge and spin. These properties are calculated with a recently developed density-matrix correlation-energy functional applied to a generalized Anderson Hamiltonian, consisting of tight-binding one-electron terms parametrizing hydrogenated amorphous silicon...

  12. Experimental and Computer Modelling Studies of Metastability of Amorphous Silicon Based Solar Cells

    OpenAIRE

    Munyeme, Geoffrey

    2003-01-01

    We present a combination of experimental and computer modelling studies of the light induced degradation in the performance of amorphous silicon based single junction solar cells. Of particular interest in this study is the degradation kinetics of different types of amorphous silicon single junction solar cells and the role of dangling bond states in mediating or driving the degradation mechanism. The approach taken in this study has enabled has to examine how light induced degradation is aff...

  13. In situ ultraviolet treatment in an Ar ambient upon p-type hydrogenated amorphous silicon-carbide windows of hydrogenated amorphous silicon based solar cells

    International Nuclear Information System (INIS)

    We proposed an in situ postdeposition ultraviolet treatment in an Ar ambient (UTA) to improve the p/i interface of amorphous silicon based solar cell. We have increased the conversion efficiency by ∼16% by improving the built-in potential and reducing recombination at the p/i interface. Through spectroscopic ellipsometry and Fourier-transform infrared measurements, it is concluded that the UTA process induces structural modification of the p-type hydrogenated amorphous silicon-carbide (p-a-SiC:H) window layer. An ultrathin p-a-SiC:H contamination layer formed during the UTA process acts as a buffer layer at the interface

  14. Evaluation of Bonding Orbitals in Amorphous Silicon by Means of the Chemical Pseudopotential Method

    OpenAIRE

    Grado Caffaro, M. A.; Grado Caffaro, M.

    1994-01-01

    The chemical pseudopotential method has been used by a number of workers in order to study the valence bands of amorphous tetrahedrally bonded semiconductors. However, various problems related to this method are unsolved. In this paper, a theoretical formulation tending to clarify some of these. problems is presented. This formulation concerns bonding orbitals and is valid, in principle, for amorphous silicon.

  15. Size modulation of nanocrystalline silicon embedded in amorphous silicon oxide by Cat-CVD

    International Nuclear Information System (INIS)

    Different issues related to controlling size of nanocrystalline silicon (nc-Si) embedded in hydrogenated amorphous silicon oxide (a-SiOx:H) deposited by catalytic chemical vapor deposition (Cat-CVD) have been reported. Films were deposited using tantalum (Ta) and tungsten (W) filaments and it is observed that films deposited using tantalum filament resulted in good control on the properties. The parameters which can affect the size of nc-Si domains have been studied which include hydrogen flow rate, catalyst and substrate temperatures. The deposited samples are characterized by X-ray diffraction, HRTEM and micro-Raman spectroscopy, for determining the size of the deposited nc-Si. The crystallite formation starts for Ta-catalyst around the temperature of 1700 oC.

  16. Quantitative assessment of molecular dynamics-grown amorphous silicon and germanium films on silicon (111)

    Science.gov (United States)

    Käshammer, Peter; Borgardt, Nikolai I.; Seibt, Michael; Sinno, Talid

    2016-09-01

    Molecular dynamics based on the empirical Tersoff potential was used to simulate the deposition of amorphous silicon and germanium on silicon(111) at various deposition rates and temperatures. The resulting films were analyzed quantitatively by comparing one-dimensional atomic density profiles to experimental measurements. It is found that the simulations are able to capture well the structural features of the deposited films, which exhibit a gradual loss of crystalline order over several monolayers. A simple mechanistic model is used to demonstrate that the simulation temperature may be used to effectively accelerate the surface relaxation processes during deposition, leading to films that are consistent with experimental samples grown at deposition rates many orders-of-magnitude slower than possible in a molecular dynamics simulation.

  17. Nickel-disilicide-assisted excimer laser crystallization of amorphous silicon

    Institute of Scientific and Technical Information of China (English)

    Liao Yan-Ping; Shao Xi-Bin; Gao Feng-Li; Luo Wen-Sheng; Wu Yuan; Fu Guo-Zhu; Jing Hai; Ma Kai

    2006-01-01

    Polycrystalline silicon (poly-Si) thin film has been prepared by means of nickel-disilicide (NiSi2) assisted excimer laser crystallization (ELC). The process to prepare a sample includes two steps. One step consists of the formation of NiSi2 precipitates by heat-treating the dehydrogenated amorphous silicon (a-Si) coated with a thin layer of Ni. And the other step consists of the formation of poly-Si grains by means of ELC. According to the test results of scanning electron microscopy (SEM), another grain growth model named two-interface grain growth has been proposed to contrast with the conventional Ni-metal-induced lateral crystallization (Ni-MILC) model and the ELC model. That is, an additional grain growth interface other than that in conventional ELC is formed, which consists of NiSi2 precipitates and a-Si.The processes for grain growth according to various excimer laser energy densities delivered to the a-Si film have been discussed. It is discovered that grains with needle shape and most of a uniform orientation are formed which grow up with NiSi2 precipitates as seeds. The reason for the formation of such grains which are different from that of Ni-MILCwithout migration of Ni atoms is not clear. Our model and analysis point out a method to prepare grains with needle shape and mostly of a uniform orientation. If such grains are utilized to make thin-film transistor, its characteristics may be improved.

  18. Pressure effects on Al89La6Ni5 amorphous alloy crystallization

    DEFF Research Database (Denmark)

    Zhuang, Yanxin; Jiang, Jianzhong; Zhou, T. J.;

    2000-01-01

    The pressure effect on the crystallization of the Al89La6Ni5 amorphous alloy has been investigated by in situ high-pressure and high-temperature x-ray powder diffraction using synchrotron radiation. The amorphous alloy crystallizes in two steps in the pressure range studied (0-4 GPa). The first......(s). The applied pressure strongly affects the crystallization processes of the amorphous alloy. Both temperatures first decrease with pressure in the pressure range of 0-1 GPa and then increase with pressure up to 4 GPa. The results are discussed with reference to competing processes between the thermodynamic...

  19. Stable, high-efficiency amorphous-silicon solar cells with low hydrogen content

    Science.gov (United States)

    Hegedus, S. S.; Phillips, J. E.

    1993-08-01

    This report describes a 21-month project to demonstrate amorphous-silicon (a-Si) solar cells with high stabilized conversion efficiency. The objective was to develop a research program spanning material issues (more stable a-Si and better a-SiGe alloys) and device issues (more stable a-Si-based solar cells) with the goal of high stabilized solar cell efficiency. The Institute of Energy Conversion (IEC) produced and analyzed the stability of a-Si films and solar cells with reduced hydrogen content (2-6%). A thermodynamic model of defect formation was developed that describes the high-temperature degraded state of a solar cell. An analysis of bi-facial current voltage and quantum efficiency results for a-SiGe p-i-n devices with transparent front and back contacts provided information about the influence of alloying and band-gap grading on hole and electron collection. IEC also studied the stability of graded and ungraded a-SiGe solar cells using bifacial devices to learn about the relative degradation of hole and electron collection, and concludes that degradation of the photoconductivity of a-SiGe materials does not agree with degradation observed in solar cells.

  20. Passivation of c-Si surfaces by sub-nm amorphous silicon capped with silicon nitride

    Science.gov (United States)

    Wan, Yimao; Yan, Di; Bullock, James; Zhang, Xinyu; Cuevas, Andres

    2015-12-01

    A sub-nm hydrogenated amorphous silicon (a-Si:H) film capped with silicon nitride (SiNx) is shown to provide a high level passivation to crystalline silicon (c-Si) surfaces. When passivated by a 0.8 nm a-Si:H/75 nm SiNx stack, recombination current density J0 values of 9, 11, 47, and 87 fA/cm2 are obtained on 10 Ω.cm n-type, 0.8 Ω.cm p-type, 160 Ω/sq phosphorus-diffused, and 120 Ω/sq boron-diffused silicon surfaces, respectively. The J0 on n-type 10 Ω.cm wafers is further reduced to 2.5 ± 0.5 fA/cm2 when the a-Si:H film thickness exceeds 2.5 nm. The passivation by the sub-nm a-Si:H/SiNx stack is thermally stable at 400 °C in N2 for 60 min on all four c-Si surfaces. Capacitance-voltage measurements reveal a reduction in interface defect density and film charge density with an increase in a-Si:H thickness. The nearly transparent sub-nm a-Si:H/SiNx stack is thus demonstrated to be a promising surface passivation and antireflection coating suitable for all types of surfaces encountered in high efficiency c-Si solar cells.

  1. Structural analysis of amorphous and hydrogen absorption alloys by neutron diffraction

    International Nuclear Information System (INIS)

    Structural studies of amorphous alloys and hydrogen absorption amorphous alloys by taking advantage of neutron and X-ray diffractions and using the reverse Monte Carlo (RMC) modeling for getting information of the three dimensional atom configuration are reviewed. Voronoi analysis of the RMC models is powerful to elucidate the structural origin of the stability of amorphous state, since Ni-Zr amorphous alloys are unstable in comparison with Cu-Zr ones. The polyhedra around Ni atoms are dominated by trigonal prism-like polyhedra. In contrast, icosahedron-like polyhedra are preferred for Cu. The Ni-Zr amorphous alloys have been reported to stabilize by adding Al. The Voronoi analysis informs us that trigonal prism-like polyhedra decreased in number by adding Al to the Ni-Zr system. On the contrary, the number of icosahedron-like polyhedra was found to increase. The results apparently indicate that the icosahedron-like polyhedra play an important role to stabilize the amorphous state. Moreover, neutron diffraction is a powerful tool to clarify the location of hydrogen atoms in the hydrogen absorption materials. For TbFe2D3.8 and TbNi2D2.4 amorphous alloys, the RMC model structure based on the diffraction data teach us that about 98% of hydrogen atoms occupy tetrahedral sites formed by metal atoms and stabilize the amorphous state. (author)

  2. Amorphous silicon-based PINIP structure for color sensor

    International Nuclear Information System (INIS)

    A series of hydrogenated amorphous silicon carbide (a-SiC:H) films was prepared by plasma enhanced chemical vapor deposition (PECVD) technology. The microstructure and photoelectronic properties of the film are investigated by absorption spectra (in the ultraviolet to near-infrared range) and Fourier transform infrared (FTIR) spectra. The results show that good band gap controllability (1.83-3.64 eV) was achieved by adjusting the plasma parameters. In the energy range around 2.1 eV, the a-Si1-xC x:H films exhibit good photosensitivity, opening the possibility to use this wide band gap material for device application, especially when blue color detectors are concerned. A multilayer device with a stack of glass/TCO(ZnO:Ga)/P(a-SiC:H)/I(a-SiC:H)/N(a-Si:H)/I(a-Si:H)/P(a-Si:H)/Al has been prepared. The devices can detect blue and red colors under different bias voltages. The optimization of the device, especially the film thickness and the band gap offset used to achieve better detectivity, is also done in this work

  3. Diffusion of Gold and Platinum in Amorphous Silicon

    CERN Multimedia

    Voss, T L

    2002-01-01

    By means of radiotracer experiments the diffusion of Au and Pt in radio-frequency-sputtered amorphous silicon (a-Si) was investigated. Specimens of a-Si with homogeneous doping concentrations of Au or Pt in the range 0$\\, - \\,$1,7~at.\\% were produced by co-sputtering of Si and Au or Pt, respectively. An additional tiny concentration of radioactive $^{195}$Au or $^{188}$Pt, about 10~at.ppm, was implanted at ISOLDE. The resulting Gaussian distribution of the implanted atoms served as a probe for measuring diffusion coefficients at various doping concentrations. It was found that for a given doping concentration the diffusion coefficients show Arrhenius-type temperature dependences, where the diffusion enthalpy and the pre-exponential factor depend on the doping concentration. From these results it was concluded that in a-Si Au and Pt undergo direct, interstitial-like diffusion that is retarded by temporary trapping of the radiotracer atoms at vacancy-type defects with different binding enthalpies. In the case o...

  4. Raman spectroscopy of PIN hydrogenated amorphous silicon solar cells

    Science.gov (United States)

    Keya, Kimitaka; Torigoe, Yoshihiro; Toko, Susumu; Yamashita, Daisuke; Seo, Hyunwoong; Itagaki, Naho; Koga, Kazunori; Shiratani, Masaharu

    2015-09-01

    Light-induced degradation of hydrogenated amorphous silicon (a-Si:H) is a key issue for enhancing competitiveness in solar cell market. A-Si:H films with a lower density of Si-H2 bonds shows higher stability. Here we identified Si-H2 bonds in PIN a-Si:H solar cells fabricated by plasma CVD using Raman spectroscopy. A-Si:H solar cell has a structure of B-doped μc-SiC:H (12.5 nm)/ non-doped a-Si:H (250nm)/ P-doped μc-Si:H (40 nm) on glass substrates (Asahi-VU). By irradiating HeNe laser light from N-layer, peaks correspond to Si-H2 bonds (2100 cm-1) and Si-H bonds (2000 cm-1) have been identified in Raman scattering spectra. The intensity ratio of Si-H2 and Si-H ISiH2/ISiH is found to correlate well to light induced degradation of the cells Therefore, Raman spectroscopy is a promising method for studying origin of light-induced degradation of PIN solar cells.

  5. Carrier transport in amorphous silicon utilizing picosecond photoconductivity

    Science.gov (United States)

    Johnson, A. M.

    1981-08-01

    The development of a high-speed electronic measurement capability permitted the direct observation of the transient photoresponse of amorphous silicon (a-Si) with a time resolution of approximately 10ps. This technique was used to measure the initial mobility of photogenerated (2.1eV) free carriers in three types of a-Si having widely different densities of structural defects (i.e., as prepared by: (1) RF glow discharge (a-Si:H); (2) chemical vapor deposition; and (3) evaporation in ultra-high vacuum). In all three types of a-Si, the same initial mobility of approximately 1 cu cm/Vs at room temperature was found. This result tends to confirm the often-made suggestion that the free carrier mobility is determined by the influence of shallow states associated with the disorder in the random atomic network, and is an intrinsic property of a-Si which is unaffected by the method of preparation. The rate of decay of the photocurrent correlates with the density of structural defects and varies from 4ps to 200ps for the three types of a-Si investigated. The initial mobility of a-Si:H was found to be thermally activated. The possible application of extended state transport controlled by multiple trapping and small polaron formation is discussed.

  6. Hot wire deposited hydrogenated amorphous silicon solar cells

    Energy Technology Data Exchange (ETDEWEB)

    Mahan, A.H.; Iwaniczko, E.; Nelson, B.P.; Reedy, R.C. Jr.; Crandall, R.S. [National Renewable Energy Lab., Golden, CO (United States)

    1996-05-01

    This paper details the results of a study in which low H content, high deposition rate hot wire (HW) deposited amorphous silicon (a-Si:H) has been incorporated into a substrate solar cell. The authors find that the treatment of the top surface of the HW i layer while it is being cooled from its high deposition temperature is crucial to device performance. They present data concerning these surface treatments, and correlate these treatments with Schottky device performance. The authors also present first generation HW n-i-p solar cell efficiency data, where a glow discharge (GD) {mu}c-Si(p) layer was added to complete the partial devices. No light trapping layer was used to increase the device Jsc. Their preliminary investigations have yielded efficiencies of up to 6.8% for a cell with a 4000 {Angstrom} thick HW i-layer, which degrade less than 10% after a 900 hour light soak. The authors suggest avenues for further improvement of their devices.

  7. Nanohole Structuring for Improved Performance of Hydrogenated Amorphous Silicon Photovoltaics.

    Science.gov (United States)

    Johlin, Eric; Al-Obeidi, Ahmed; Nogay, Gizem; Stuckelberger, Michael; Buonassisi, Tonio; Grossman, Jeffrey C

    2016-06-22

    While low hole mobilities limit the current collection and efficiency of hydrogenated amorphous silicon (a-Si:H) photovoltaic devices, attempts to improve mobility of the material directly have stagnated. Herein, we explore a method of utilizing nanostructuring of a-Si:H devices to allow for improved hole collection in thick absorber layers. This is achieved by etching an array of 150 nm diameter holes into intrinsic a-Si:H and then coating the structured material with p-type a-Si:H and a conformal zinc oxide transparent conducting layer. The inclusion of these nanoholes yields relative power conversion efficiency (PCE) increases of ∼45%, from 7.2 to 10.4% PCE for small area devices. Comparisons of optical properties, time-of-flight mobility measurements, and internal quantum efficiency spectra indicate this efficiency is indeed likely occurring from an improved collection pathway provided by the nanostructuring of the devices. Finally, we estimate that through modest optimizations of the design and fabrication, PCEs of beyond 13% should be obtainable for similar devices. PMID:27227369

  8. Power change in amorphous silicon technology by low temperature annealing

    Directory of Open Access Journals (Sweden)

    Mittal Ankit

    2015-01-01

    Full Text Available Amorphous silicon (a-Si is one of the best established thin-film solar-cell technologies. Despite its long history of research, it still has many critical issues because of its defect rich material and its susceptibility to degrade under light also called as Staebler-Wronski effect (SWE. This leads to an increase in the defect density of a-Si, but as a metastable effect it can be completely healed at temperatures above 170 °C. Our study is focused on investigating the behavior of annealing of different a-Si modules under low temperature conditions below 80 °C indicated by successive change of module power. These conditions reflect the environmental temperature impact of the modules in the field, or integrated in buildings as well. The power changes were followed by STC power rating and investigation of module-power evolution under low irradiance conditions at 50 W/m2. Our samples were recovered close to their initial state of power, reaching as high as 99% from its degraded value. This shows the influence of low temperature annealing and light on metastable module behavior in a-Si thin-film modules.

  9. Optical position detectors based on thin film amorphous silicon

    Science.gov (United States)

    Henry, Jasmine; Livingstone, John

    2001-10-01

    Thin film optical position sensitive detectors (PSDs) based on novel hydrogenated amorphous silicon Schottky barrier (SB) structures are compared in this work. The three structures reported here have been tested under different light sources to measure their linear properties and wavelength response characteristics. The sputtered a-Si sensors were configured as layered structures of platinum, a-Si and indium tin oxide, forming SB-i-n devices and exhibited linear properties similar to multi-layer a-Si p-i- n devices produced by complex chemical vapor deposition procedures, which involve flammable and toxic gases. All structures were test4ed as possible configurations for 2D sensors. The devices were tested under white light, filtered white light and also a red diode laser. Each of the three structures responded quite differently to each of the sources. Results, based on the correlation coefficient, which measures the linearity of output and which has a maximum value of 1, produced r values ranging between 0.992 to 0.999, in the best performances.

  10. Hydrogenated amorphous silicon thin film anode for proton conducting batteries

    Science.gov (United States)

    Meng, Tiejun; Young, Kwo; Beglau, David; Yan, Shuli; Zeng, Peng; Cheng, Mark Ming-Cheng

    2016-01-01

    Hydrogenated amorphous Si (a-Si:H) thin films deposited by chemical vapor deposition were used as anode in a non-conventional nickel metal hydride battery using a proton-conducting ionic liquid based non-aqueous electrolyte instead of alkaline solution for the first time, which showed a high specific discharge capacity of 1418 mAh g-1 for the 38th cycle and retained 707 mAh g-1 after 500 cycles. A maximum discharge capacity of 3635 mAh g-1 was obtained at a lower discharge rate, 510 mA g-1. This electrochemical discharge capacity is equivalent to about 3.8 hydrogen atoms stored in each silicon atom. Cyclic voltammogram showed an improved stability 300 mV below the hydrogen evolution potential. Both Raman spectroscopy and Fourier transform infrared spectroscopy studies showed no difference to the pre-existing covalent Si-H bond after electrochemical cycling and charging, indicating a non-covalent nature of the Si-H bonding contributing to the reversible hydrogen storage of the current material. Another a-Si:H thin film was prepared by an rf-sputtering deposition followed by an ex-situ hydrogenation, which showed a discharge capacity of 2377 mAh g-1.

  11. Experiment and Simulation Study on the Amorphous Silicon Photovoltaic Walls

    Directory of Open Access Journals (Sweden)

    Wenjie Zhang

    2014-01-01

    Full Text Available Based on comparative study on two amorphous silicon photovoltaic walls (a-Si PV walls, the temperature distribution and the instant power were tested; and with EnergyPlus software, similar models of the walls were built to simulate annual power generation and air conditioning load. On typical sunshine day, the corresponding position temperature of nonventilated PV wall was generally 0.5~1.5°C higher than that of ventilated one, while the power generation was 0.2%~0.4% lower, which was consistent with the simulation results with a difference of 0.41% in annual energy output. As simulation results, in summer, comparing the PV walls with normal wall, the heat per unit area of these two photovoltaic walls was 5.25 kWh/m2 (nonventilated and 0.67 kWh/m2 (ventilated higher, respectively. But in winter the heat loss of nonventilated one was smaller, while ventilated PV wall was similar to normal wall. To annual energy consumption of heating and cooling, the building with ventilated PV wall and normal wall was also similar but slightly better than nonventilated one. Therefore, it is inferred that, at low latitudes, such as Zhuhai, China, air gap ventilation is suitable, while the length to thickness ratio of the air gap needs to be taken into account.

  12. Electrical characterization of hydrogenated amorphous silicon oxide films

    Science.gov (United States)

    Itoh, Takashi; Katayama, Ryuichi; Yamakawa, Koki; Matsui, Kento; Saito, Masaru; Sugiyama, Shuhichiroh; Sichanugrist, Porponth; Nonomura, Shuichi; Konagai, Makoto

    2015-08-01

    The electrical characterization of hydrogenated amorphous silicon oxide (a-SiOx:H) films was performed by electron spin resonance (ESR) and electrical conductivity measurements. In the ESR spectra of the a-SiOx:H films, two ESR peaks with g-values of 2.005 and 2.013 were observed. The ESR peak with the g-value of 2.013 was not observed in the ESR spectra of a-Si:H films. The photoconductivity of the a-SiOx:H films decreased with increasing spin density estimated from the ESR peak with the g-value of 2.005. On the other hand, photoconductivity was independent of spin density estimated from the ESR peak with the g-value of 2.013. The optical absorption coefficient spectra of the a-SiOx:H films were also measured. The spin density estimated from the ESR peak with the g-value of 2.005 increased proportionally with increasing optical absorption owing to the gap-state defect.

  13. Fracture properties of hydrogenated amorphous silicon carbide thin films

    International Nuclear Information System (INIS)

    The cohesive fracture properties of hydrogenated amorphous silicon carbide (a-SiC:H) thin films in moist environments are reported. Films with stoichiometric compositions (C/Si ≈ 1) exhibited a decreasing cohesive fracture energy with decreasing film density similar to other silica-based hybrid organic–inorganic films. However, lower density a-SiC:H films with non-stoichiometric compositions (C/Si ≈ 5) exhibited much higher cohesive fracture energy than the films with higher density stoichiometric compositions. One of the non-stoichiometric films exhibited fracture energy (∼9.5 J m−2) greater than that of dense silica glasses. The increased fracture energy was due to crack-tip plasticity, as demonstrated by significant pileup formation during nanoindentation and a fracture energy dependence on film thickness. The a-SiC:H films also exhibited a very low sensitivity to moisture-assisted cracking compared with other silica-based hybrid films. A new atomistic fracture model is presented to describe the observed moisture-assisted cracking in terms of the limited Si-O-Si suboxide bond formation that occurs in the films.

  14. Amorphization and reduction of thermal conductivity in porous silicon by irradiation with swift heavy ions

    International Nuclear Information System (INIS)

    In this article, we demonstrate that the thermal conductivity of nanostructured porous silicon is reduced by amorphization and also that this amorphous phase in porous silicon can be created by swift (high-energy) heavy ion irradiation. Porous silicon samples with 41%-75% porosity are irradiated with 110 MeV uranium ions at six different fluences. Structural characterisation by micro-Raman spectroscopy and SEM imaging show that swift heavy ion irradiation causes the creation of an amorphous phase in porous Si but without suppressing its porous structure. We demonstrate that the amorphization of porous silicon is caused by electronic-regime interactions, which is the first time such an effect is obtained in crystalline silicon with single-ion species. Furthermore, the impact on the thermal conductivity of porous silicon is studied by micro-Raman spectroscopy and scanning thermal microscopy. The creation of an amorphous phase in porous silicon leads to a reduction of its thermal conductivity, up to a factor of 3 compared to the non-irradiated sample. Therefore, this technique could be used to enhance the thermal insulation properties of porous Si. Finally, we show that this treatment can be combined with pre-oxidation at 300 °C, which is known to lower the thermal conductivity of porous Si, in order to obtain an even greater reduction

  15. Crystallization kinetics and magnetic properties of FeSiCr amorphous alloy powder cores

    Science.gov (United States)

    Xu, Hu-ping; Wang, Ru-wu; Wei, Ding; Zeng, Chun

    2015-07-01

    The crystallization kinetics of FeSiCr amorphous alloy, characterized by the crystallization activation energy, Avrami exponent and frequency factor, was studied by non-isothermal differential scanning calorimetric (DSC) measurements. The crystallization activation energy and frequency factor of amorphous alloy calculated from Augis-Bennett model were 476 kJ/mol and 5.5×1018 s-1, respectively. The Avrami exponent n was calculated to be 2.2 from the Johnson-Mehl-Avrami (JMA) equation. Toroid-shaped Fe-base amorphous powder cores were prepared from the commercial FeSiCr amorphous alloy powder and subsequent cold pressing using binder and insulation. The characteristics of FeSiCr amorphous alloy powder and the effects of compaction pressure and insulation content on the magnetic properties, i.e., effective permeability μe, quality factor Q and DC-bias properties of FeSiCr amorphous alloy powder cores, were investigated. The FeSiCr amorphous alloy powder cores exhibit a high value of quality factor and a stable permeability in the frequency range up to 1 MHz, showing superior DC-bias properties with a "percent permeability" of more than 82% at H=100 Oe.

  16. STUDY ON MAXIMUM HYDROGEN CAPACITY FOR Zr-Ni AMORPHOUS ALLOY

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    To design the amorphous hydrogen storage alloy efficiently, the maximum hydrogen capacities for Zr-Ni amorphous alloy were calculated. Based on the Rhomb Unit Structure Model(RUSM) for amorphous alloy and the experimental result that hydrogen atoms exist in 3Zr1Ni and 4Zr tetrahedron interstices in Zr-Ni amorphous alloy, the numbers of 3Zr-1Ni and 4Zr tetrahedron interstices in a RUSM were calculated which correspond to the hydrogen capacity. The two extremum Zr distribution states were calculated, such as highly heterogeneous Zr distribution and homogeneous Zr distribution. The calculated curves of hydrogen capacity with different Zr contents at two states indicate that the hydrogen capacity increases with increasing Zr content and reaches its maximum when Zr is 75%. The theoretical maximum hydrogen capacity for Zr-Ni amorphous alloy is 2.0(H/M). Meanwhile, the hydrogen capacity of heterogeneous Zr distribution alloy is higher than that of homogenous one at the same Zr content. The experimental results prove the calculated results reasonable, and accordingly, the experimental results that the distribution of Zr atom in amorphous alloy occur heterogeneous after a few hydrogen absorption-desorption cycles can be explained.

  17. A review of ordering phenomena in iron-silicon alloys

    OpenAIRE

    González, F.; Houbaert, Y

    2013-01-01

    Silicon steel is an industrially-desired alloy of iron and silicon, characterised by soft magnetic properties, low eddy-current losses, and low magnetostriction. Silicon steels have narrow hysteresis cycles, making them particularly advantageous in applications using electromagnetic fields, such as transformers, generators, electric motor cores, and few other components in industry. Despite its incontestable industrial value, there is not much agreement on the atomic structure of silicon stee...

  18. Spectroscopic and mechanical studies on the Fe-based amorphous alloy 2605SA1

    Energy Technology Data Exchange (ETDEWEB)

    Cabral P, A.; Garcia S, I. [ININ, Departamento de Quimica, Carretera Mexico-Toluca s/n, 52750 Ocoyoacac, Estado de Mexico (Mexico); Contreras V, J. A.; Garcia S, F. [Universidad Autonoma del Estado de Mexico, Facultad de Ciencias, El Cerrillo Piedras Blancas, Toluca, Estado de Mexico (Mexico); Nava, N., E-mail: agustin.cabral@inin.gob.m [Instituto Mexicano del Petroleo, Eje Central Lazaro Cardenas No. 152, Col. San Bartolo Atepehuacan, 07730 Mexico D. F. (Mexico)

    2010-07-01

    The Vickers micro-hardness of this alloy was unusually dependent on the heat treatment from 300 to 634 K, inferring important micro-structural changes and the presence of amorphous grains before its phase transition. Once the alloy is crystallized, the micro-hardness is characteristic of a brittle alloy, the main problem of these alloys. Within the amorphous state, other properties like free-volume, magnetic states and Fe-Fe distances were followed by Positron annihilation lifetime spectroscopy and Moessbauer spectroscopy, respectively, to analyze those micro-structural changes, thermally induced, which are of paramount interest to understand their brittleness problem. (Author)

  19. NEW METHOD OF PRODUCTION OF ALUNINUM SILICON ALLOYS

    Directory of Open Access Journals (Sweden)

    V. K. Afanasiev

    2015-01-01

    Full Text Available A new approach to the preparation of aluminum-silicon alloys, based on the concept of the leading role of hydrogen in determining the structure and properties of alloys consists in using as charge materials of silicon dioxide (silica and hydrogen instead of crystalline silicon was described. Practical ways to implement the new method were proposed on the example of industrial alloys prepared on charge synthetic alloy. It is shown that the application of the proposed method allows to improve the mechanical properties and reduce the coefficient of thermal expansion alloys, Al-Si. The effect of heat treatment on mechanical properties, density and thermal expansion of synthetic alloys was researched.

  20. High pressure magnetic behaviour of amorphous Ysub(x)Nisub(1-x) alloys

    International Nuclear Information System (INIS)

    High pressure magnetization and Curie temperature measurements have been performed on several amorphous Ysub(x)Nisub(1-x) alloys. The results seem to indicate that ferromagnetism disappears in a rather inhomogeneous way

  1. Effect of High Temperature Aging on the Corrosion Resistance of Iron Based Amorphous Alloys

    Energy Technology Data Exchange (ETDEWEB)

    Day, S D; Haslam, J J; Farmer, J C; Rebak, R B

    2007-08-10

    Iron-based amorphous alloys can be more resistant to corrosion than polycrystalline materials of similar compositions. However, when the amorphous alloys are exposed to high temperatures they may recrystallize (or devitrify) thus losing their resistance to corrosion. Four different types of amorphous alloys melt spun ribbon specimens were exposed to several temperatures for short periods of time. The resulting corrosion resistance was evaluated in seawater at 90 C and compared with the as-prepared ribbons. Results show that the amorphous alloys can be exposed to 600 C for 1-hr. without losing the corrosion resistance; however, when the ribbons were exposed at 800 C for 1-hr. their localized corrosion resistance decreased significantly.

  2. Competitive precipitation of amorphous and crystalline silicon nitride in ferrite: Interaction between structure, morphology, and stress relaxation

    International Nuclear Information System (INIS)

    We present a detailed analysis based on both experimental and modeling approaches of the unique silicon nitride precipitation sequence recently observed in ferritic Fe–Si alloys upon nitriding. At 570 °C, silicon nitride forms as an amorphous phase of size-dependent cuboidal morphology which results from the symmetry of matrix crystal structure. These amorphous precipitates are stable over remarkably long treatment durations. However, we demonstrate here that it is possible to trigger a transition to the precipitation of a crystalline modification of Si3N4 by switching to a denitriding medium at the same temperature. This change in structure is associated with a change from the cube-like morphology to a hexagonal prism shape. This unique phenomenon, driven by a classical nucleation and growth process, can be explained by the shift of stress-relief mechanism related to the change of atmosphere. The plentiful availability of nitrogen atoms during nitriding allows a strong relaxation of the precipitation-induced stress, which is energetically more favorable to the amorphous phase. Upon annealing in a low nitrogen activity medium, nitrogen in solid solution diffuses outward and no longer relieves the precipitation-induced stress. In that configuration, the crystalline modification of Si3N4 becomes more stable owing to its lower associated stress. It precipitates in a hexagonal prism shape, which is the equilibrium shape dictated by the crystal symmetries of both the matrix and the precipitates

  3. EFFECTS OF ARGON ON THE PROPERTIES OF RF SPUTTERED AMORPHOUS SILICON

    OpenAIRE

    Shao-Qi, Peng; Qai, Yu; Xian, Zhang; Jing, Ye

    1981-01-01

    The Effects of argon on the properties of rf sputtered amorphous silicon film have been investigated. As the sputtering argon pressure is increased from 2 to 20 mTorr, the content of argon in the amorphous silicon film increases apparently (Argon/Silicon : from 10-2 to 5 x 10-2). The other properties measured as a function of argon pressure PAr show that as the PAr is increased, the photoconductivity, resistivity (300K), conductivity activation energy and optical gap increase also, while the ...

  4. Holmium redistribution during solid phase epitaxial crystallization in amorphized silicon layers

    International Nuclear Information System (INIS)

    The concentration profiles of holmium were studied after annealing of silicon layers at 620 deg C. Silicon was implanted with Ho+ ions at 1 MeV energy and (1-3) · 1014 cm-2 doses. Recrystallization of amorphized silicon layer occurs by the mechanism of the solid phase epitaxy. The regularities of segregation redistribution of Ho impurity are similar to the Er redistribution regularities studied earlier. A decrease of Ho concentration at the initial stage of solid phase epitaxial recrystallization is due to a low velocity of mass transport through the crystal-amorphous interface

  5. Calorimetric studies of non-isothermal crystallization in amorphous CuTi100– alloys

    Indian Academy of Sciences (India)

    N Mehta; K Singh; N S Saxena

    2011-12-01

    The present paper reports the composition dependence of pre-exponential factor and activation energy of non-isothermal crystallization in amorphous alloys of CuTi100– system using differential scanning calorimeter (DSC) technique. The applicability of Meyer–Neldel relation between the pre-exponential factor and activation energy of non-isothermal crystallization for amorphous alloys of Cu–Ti system was verified.

  6. Initial crystal structure of alloys being amorphisized, amorphous ribbon quality and good yield

    International Nuclear Information System (INIS)

    A study is made into crystal structure of Fe75Ni2B14Si9 and Fe81C1.7B14Si3.3 alloys. It is shown that on casting magnetically soft amorphous alloys the crystals of excessive phase Fe2B are practically always precipitate from the matrix and cause the violations of casting technology for amorphous ribbon production. Accelerated cooling of ingots and melt modification are considered to be useful to prevent coarse crystal formation

  7. Welding of cobalt-based amorphous alloys with Nd: YAG laser

    International Nuclear Information System (INIS)

    The paper describes the results concerning the investigation of the welding of cobalt-based amorphous alloys with Nd:YAG laser. Five alloys with different chemical structure and dimensions in shape of amorphous metal foils were welded. The quality of the welded joints were tested by using a microstructure analysis with an optical microscope and SEM, when the metal graphic structure, the chemical structure and the microhardness of the welded joints were tested as well. (Author)

  8. Amorphous Formation in an Undercooled Binary Ni-Si Alloy under Slow Cooling Rate

    Institute of Scientific and Technical Information of China (English)

    Yiping Lu; Gencang Yang; Xiong Li; Yaohe Zhou

    2009-01-01

    High undercooling up to 392 K was achieved in eutectic Ni70.2Si29.8 alloy melt by using glass fluxing combined with cyclic superheating.A small quantity of amorphous phase was obtained in bulk eutectic Ni70.2Si29.8 alloy when undercooling exceeds 240 K under slow cooling conditions (about 1 K/s).The amorphous phase was confirmed by high-resolution transmission electron microscopy and differential scanning calorimetry.

  9. Fabrication of amorphous silicon nanoribbons by atomic force microscope tip induced local oxidation for thin film device applications

    OpenAIRE

    Pichon, Laurent; Rogel, Regis; Demami, Fouad

    2010-01-01

    WOS International audience We demonstrate the feasibility of induced local oxidation of amorphous silicon by atomic force microscopy. The resulting local oxide is used as mask for the elaboration of thin film silicon resistor. A thin amorphous silicon layer deposited on a glass substrate is locally oxidized following narrow continuous lines. The corresponding oxide line is then used as mask during plasma etching of the amorphous layer leading to the formation of nanoribbon. Such amorpho...

  10. Corrosion resistance of amorphous and crystalline Pd40Ni40P20 alloys in aqueous solutions

    DEFF Research Database (Denmark)

    Wu, Y.F.; Chiang, Wen-Chi; Chu, J.; Nieh, T.G.; Kawamura, Y.; Wu, J.K.

    2006-01-01

    The corrosion behaviors of amorphous and crystalline Pd40Ni40P20 alloys in various aqueous solutions are reported in this paper. The corrosion resistance of crystalline (annealed) Pd40Ni40P20 is better than that of amorphous Pd40Ni40P20 in various corrosive solutions, due to crystalline Pd40Ni40P...

  11. Amorphous silicon research. Final technical progress report, 1 August 1994--28 February 1998

    Energy Technology Data Exchange (ETDEWEB)

    Guha, S [United Solar Systems Corp., Troy, MI (United States)

    1998-05-01

    This report describes the status and accomplishments of work performed under this subcontract by United Solar Systems. United Solar researchers explored several new deposition regimes/conditions to investigate their effect on material/device performance. To facilitate optimum ion bombardment during growth, a large parameter space involving chamber pressure, rf power, and hydrogen dilution were investigated. United Solar carried out a series of experiments using discharge modulation at various pulsed-plasma intervals to study the effect of Si-particle incorporation on solar cell performance. Hydrogen dilution during deposition is found to improve both the initial and stable performance of a-Si and a-SiGe alloy cells. Researchers conducted a series of temperature-ramping experiments on samples prepared with high and low hydrogen dilutions to study the effect of hydrogen effusion on solar cell performance. Using an internal photoemission method, the electrical bandgap of a microcrystalline p layer used in high-efficiency solar cells was measured to be 1.6 eV. New measurement techniques were developed to evaluate the interface and bulk contributions of losses to solar cell performance. Researchers replaced hydrogen with deuterium and found deuterated amorphous silicon alloy solar cells exhibit reduced light-induced degradation. The incorporation of a microcrystalline n layer in a multijunction cell is seen to improve cell performance. United Solar achieved a world-record single-junction a-Si alloy stable cell efficiency of 9.2% with an active area of 0.25 cm{sup 2} grown with high hydrogen dilution. They also achieved a world-record triple-junction, stable, active-area cell efficiency of 13.0% with an active area of 0.25 cm{sup 2}.

  12. A novel approach to quantify nitrogen distribution in nanocrystalline-amorphous alloys

    Energy Technology Data Exchange (ETDEWEB)

    Amini, R. [Department of Materials Science and Engineering, School of Engineering, Shiraz University, Zand Blvd., 7134851154, Shiraz (Iran, Islamic Republic of); Department of Materials Science and Engineering, Shiraz University of Technology, Modarres Blvd., 3619995161, Shiraz (Iran, Islamic Republic of); Salahinejad, E., E-mail: erfan.salahinejad@gmail.com [Department of Materials Science and Engineering, School of Engineering, Shiraz University, Zand Blvd., 7134851154, Shiraz (Iran, Islamic Republic of); Hadianfard, M.J.; Bajestani, E. Askari [Department of Materials Science and Engineering, School of Engineering, Shiraz University, Zand Blvd., 7134851154, Shiraz (Iran, Islamic Republic of); Sharifzadeh, M. [School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798 (Singapore)

    2011-02-03

    Research highlights: > A novel method is introduced to determine nitrogen distribution in nanocrystalline-amorphous alloys, based on X-ray diffraction, thermogravimetry, and differential scanning calorimetery. > The technique determines the contribution of crystal interstitial sites, crystalline defects, and amorphous phase to nitrogen incorporation. > In Fe-18Cr-8Mn-2.5N alloy synthesized by mechanical alloying, about 4, 21 and 75 percent of nitrogen is distributed among the crystal interstitial sites, defects, and amorphous phase, respectively. - Abstract: A method is introduced to estimate nitrogen partitioning in the structure of nanocrystalline-amorphous alloys, based on X-ray diffraction, thermogravimetry, and differential scanning calorimetery. The technique quantitatively determines the contribution of crystal interstitial sites, crystalline defects, and amorphous phase to nitrogen incorporation. Typically, the method shows that in Fe-18Cr-8Mn-2.5N alloy synthesized by mechanical alloying, about 4, 21 and 75 percent of nitrogen is distributed among the crystal interstitial sites, defects, and amorphous phase, respectively.

  13. Stabilization of amorphous structure in silicon thin film by adding germanium

    International Nuclear Information System (INIS)

    The stabilization of the amorphous structure in amorphous silicon film by adding Ge atoms was studied using Raman spectroscopy. Amorphous Si1−xGex (x = 0.0, 0.03, 0.14, and 0.27) films were deposited on glass substrates from electron beam evaporation sources and annealed in N2 atmosphere. The change in the amorphous states and the phase transition from amorphous to crystalline were characterized using the TO, LO, and LA phonons in the Raman spectra. The temperature of the transition from the amorphous phase to the crystalline phase was higher for the a-Si1−xGex (x = 0.03, 0.14) films, and the crystallization was hindered. The reason why the addition of a suitable quantity of Ge atoms into the three-dimensional amorphous silicon network stabilizes its amorphous structure is discussed based on the changes in the Raman signals of the TO, LO, and LA phonons during annealing. The characteristic bond length of the Ge atoms allows them to stabilize the random network of the amorphous Si composed of quasi-tetrahedral Si units, and obstruct its rearrangement

  14. Growth and defect chemistry of amorphous hydrogenated silicon

    Science.gov (United States)

    Scott, Bruce A.; Reimer, Jeffrey A.; Longeway, Paul A.

    1983-12-01

    Magnetic resonance (NMR,EPR) and infrared studies are presented of amorphous hydrogenated silicon (a-Si:H) films prepared by homogeneous chemical vapor deposition (HOMOCVD) and rf plasma decomposition using silane and disilane. Hydrogen incorporation occurs with a small activation energy (˜0.06 eV) for all films, while the barrier for changes in spin defect density is almost an order of magnitude larger and comparable to that measured in defect annealing studies. Films deposited by rf(Si2H6) plasma exhibit the greatest hydrogen contents, followed by HOMOCVD and rf(SiH4) plasma material. NMR measurements suggest that HOMOCVD films are less disordered than plasma-deposited a-Si:H. Previous work and recent kinetic studies of plasma and thermal environments are extensively analyzed, along with thermodynamic and kinetic data, to determine a a-Si:H growth mechanisms most consistent with the experimental results. The model presented to explain compositional and defect changes with substrate temperature emphasizes plasma deposition by monoradical precursors and HOMOCVD growth by diradicals, resulting initially in a similar surface-bound intermediate in all cases. Plasma growth from Si2H6 involves the surface attachment of longer radical chains, compared to SiH4, while oligomeric diradicals could be present in HOMOCVD. The possibility that reactions at the hot reactor wall, as well as in the gas, create monoradicals in HOMOCVD is also explored in detail. Finally, film dehydrogenation and crosslinking reactions are examined, and experiments proposed to determine the channels most relevant for each deposition environment.

  15. Dynamics of hydrogenated amorphous silicon flexural resonators for enhanced performance

    Science.gov (United States)

    Mouro, J.; Chu, V.; Conde, J. P.

    2016-04-01

    Hydrogenated amorphous silicon thin-film flexural resonators with sub-micron actuation gaps are fabricated by surface micromachining on glass substrates. Experimentally, the resonators are electrostatically actuated and their motion is optically detected. Three different configurations for the electrostatic excitation force are used to study the dynamics of the resonators. In the first case, a dc voltage (Vdc) is added to an ac voltage with variable excitation frequency (Vac(ω)) and harmonic, superharmonic, and subharmonic resonances of different orders are observed. The second case consists on mixing the dc voltage (Vdc) with an ac voltage applied at a fixed frequency of twice the natural frequency of the resonator (V(2ω0)). High-amplitude parametric resonance is excited at the natural frequency of the system, ω0. This configuration allows a separation between the frequencies of the excitation and the mechanical motion. Finally, in the third case, the dc voltage (Vdc) is combined with both ac voltages, Vac(ω) and V(2ω0), and parametric resonance is excited and emerges from the fundamental harmonic resonance peak. The single-degree-of-freedom equation of motion is modeled and discussed for each case. The nonlinearity inherent to the electrostatic force is responsible for modulating the spring constant of the system at different frequencies, giving rise to parametric resonance. These equations of motion are simulated in the time and frequency domains, providing a consistent explanation of the experimentally observed phenomena. A wide variety of possible resonance modes with different characteristics can be used advantageously in MEMS device design.

  16. Fiber Optic Excitation of Silicon Microspheres in Amorphous and Crystalline Fluids

    Science.gov (United States)

    Yılmaz, Huzeyfe; Yılmaz, Hasan; Sharif Murib, Mohammed; Serpengüzel, Ali

    2016-03-01

    This study investigates the optical resonance spectra of free-standing monolithic single crystal silicon microspheres immersed in various amorphous fluids, such as air, water, ethylene glycol, and 4-Cyano-4'-pentylbiphenyl nematic liquid crystal. For the various amorphous fluids, morphology-dependent resonances with quality factors on the order of 105 are observed at 1428 nm. The mode spacing is always on the order of 0.23 nm. The immersion in various amorphous fluids affects the spectral response of the silicon microsphere and heralds this technique for use in novel optofluidics applications. Even though the nematic liquid crystal is a highly birefringent, scattering, and high-index optical medium, morphology-dependent resonances with quality factors on the order of 105 are observed at 1300 nm in the elastic scattering spectra of the silicon microsphere, realizing a liquid-crystal-on-silicon geometry. The relative refractive index and the size parameter of the silicon microsphere are the parameters that affect the resonance structure. The more 4-Cyano-4'-pentylbiphenyl interacting with the silicon microsphere, the lower the quality factor of the resonances is. The more 4-Cyano-4'-pentylbiphenyl is interacting with the silicon microsphere, the lower the mode spacing Δλ of the resonances is. The silicon microspheres wetted with nematic liquid crystal can be used for optically addressed liquid-crystal-on-silicon displays, light valve applications, or reconfigurable optical networks.

  17. Amorphous-silicon module hot-spot testing

    Science.gov (United States)

    Gonzalez, C. C.

    1985-01-01

    Hot spot heating occurs when cell short-circuit current is lower than string operating current. Amorphous cell hot spot are tested to develop the techniques required for performing reverse bias testing of amorphous cells. Also, to quantify the response of amorphous cells to reverse biasing. Guidelines are developed from testing for reducing hot spot susceptibility of amorphous modules and to develop a qualification test for hot spot testing of amorphous modules. It is concluded that amorphous cells undergo hot spot heating similarly to crystalline cells. Comparison of results obtained with submodules versus actual modules indicate heating levels lower in actual modules. Module design must address hot spot testing and hot spot qualification test conducted on modules showed no instabilities and minor cell erosion.

  18. Formation of amorphous silicon by light ion damage

    International Nuclear Information System (INIS)

    Amorphization by implantation of boron ions (which is the lightest element generally used in I.C. fabrication processes) has been systematically studied for various temperatures, various voltages and various dose rates. Based on theoretical considerations and experimental results, a new amorphization model for light and intermediate mass ion damage is proposed consisting of two stages. The role of interstitial type point defects or clusters in amorphization is emphasized. Due to the higher mobility of interstitials out-diffusion to the surface particularly during amorphization with low energy can be significant. From a review of the idealized amorphous structure, diinterstitial-divacancy pairs are suggested to be the embryos of amorphous zones formed during room temperature implantation. The stacking fault loops found in specimens implanted with boron at room temperature are considered to be the origin of secondary defects formed during annealing

  19. Memory effect under pressure in low density amorphous silicon

    OpenAIRE

    Garg, Nandini; Pandey, K. K.; K. V. Shanavas; Betty, C. A.; Sharma, Surinder M

    2010-01-01

    Our investigations on porous Si show that on increase of pressure it undergoes crystalline phase transitions instead of pressure induced amorphization - claimed earlier, and the amorphous phase appears only on release of pressure. This amorphous phase, when subjected to higher pressures, transforms reversibly to a higher coordinated primitive hexagonal phase showing a kind of memory effect which may be the only example of its kind in the elemental solids. First principles calculations and the...

  20. Reaction of amorphous Ni-W and Ni-N-W films with substrate silicon

    Science.gov (United States)

    Zhu, M. F.; Suni, I.; Nicolet, M.-A.; Sands, T.

    1984-01-01

    Wiley et al. (1982) have studied sputtered amorphous films of Nb-Ni, Mo-Ni, Si-W, and Si-Mo. Kung et al. (1984) have found that amorphous Ni-Mo films as diffusion barriers between multilayer metallizations on silicon demonstrate good electrical and thermal stability. In the present investigation, the Ni-W system was selected because it is similar to the Ni-Mo system. However, W has a higher silicide formation temperature than Mo. Attention is given to aspects of sample preparation, sample characterization, the interaction between amorphous Ni-W films and Si, the crystallization of amorphous Ni(36)W(64) films on SiO2, amorphous Ni-N-W films, silicide formation and phase separation, and the crystallization of amorphous Ni(36)W(64) and Ni(30)N(21)W(49) layers.

  1. Crystallization kinetics and magnetic properties of FeSiCr amorphous alloy powder cores

    Energy Technology Data Exchange (ETDEWEB)

    Xu, Hu-ping [School of Logistics Engineering, Wuhan University of Technology, Wuhan 430063 (China); Wang, Ru-wu, E-mail: ruwuwang@hotmail.com [National Engineering Research Center For Silicon Steel, Wuhan 430080 (China); College of Materials Science and Metallurgical Engineering, Wuhan University of Science and Technology, Wuhan 430081 (China); Wei, Ding [School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Zeng, Chun [National Engineering Research Center For Silicon Steel, Wuhan 430080 (China)

    2015-07-01

    The crystallization kinetics of FeSiCr amorphous alloy, characterized by the crystallization activation energy, Avrami exponent and frequency factor, was studied by non-isothermal differential scanning calorimetric (DSC) measurements. The crystallization activation energy and frequency factor of amorphous alloy calculated from Augis–Bennett model were 476 kJ/mol and 5.5×10{sup 18} s{sup −1}, respectively. The Avrami exponent n was calculated to be 2.2 from the Johnson–Mehl–Avrami (JMA) equation. Toroid-shaped Fe-base amorphous powder cores were prepared from the commercial FeSiCr amorphous alloy powder and subsequent cold pressing using binder and insulation. The characteristics of FeSiCr amorphous alloy powder and the effects of compaction pressure and insulation content on the magnetic properties, i.e., effective permeability μ{sub e}, quality factor Q and DC-bias properties of FeSiCr amorphous alloy powder cores, were investigated. The FeSiCr amorphous alloy powder cores exhibit a high value of quality factor and a stable permeability in the frequency range up to 1 MHz, showing superior DC-bias properties with a “percent permeability” of more than 82% at H=100 Oe. - Highlights: • The crystallization kinetics of FeSiCr amorphous alloy was investigated. • The FeSiCr powder cores exhibit a high value of Q and a stable permeability. • The FeSiCr powder cores exhibit superior DC-bias properties.

  2. Anisotropic phase separation in amorphous Fe--Ge alloys

    International Nuclear Information System (INIS)

    Magnetron sputtered amorphous FexGe100-x films have been examined with anomalous small-angle x-ray scattering (ASAXS) in an attempt to characterize composition fluctuations which have been previously reported in this system. Films grown under various deposition conditions have been studied, with the scattering vector both in and oblique to the plane of the films, to search for anisotropy. By manipulating the deposited power flux and rates of growth, films which have the same composition can be grown to different states of phase separation. The total correlation functions have been calculated from the oblique scattering experiments. The anisotropy can be successfully modeled as a close-packing of oriented prolate ellipsoidal particles, with the elongated axis along the direction of film growth. A method for using these measurements to determine the compositions of the phase-separating species has been developed and utilized. The results indicate phase separation into a-Ge and a-FeGe2 for the a-FexGe100-x (x<33) alloy

  3. Passivation of c-Si surfaces by sub-nm amorphous silicon capped with silicon nitride

    Energy Technology Data Exchange (ETDEWEB)

    Wan, Yimao, E-mail: yimao.wan@anu.edu.au; Yan, Di; Bullock, James; Zhang, Xinyu; Cuevas, Andres [Research School of Engineering, The Australian National University, Canberra, Australian Capital Territory 0200 (Australia)

    2015-12-07

    A sub-nm hydrogenated amorphous silicon (a-Si:H) film capped with silicon nitride (SiN{sub x}) is shown to provide a high level passivation to crystalline silicon (c-Si) surfaces. When passivated by a 0.8 nm a-Si:H/75 nm SiN{sub x} stack, recombination current density J{sub 0} values of 9, 11, 47, and 87 fA/cm{sup 2} are obtained on 10 Ω·cm n-type, 0.8 Ω·cm p-type, 160 Ω/sq phosphorus-diffused, and 120 Ω/sq boron-diffused silicon surfaces, respectively. The J{sub 0} on n-type 10 Ω·cm wafers is further reduced to 2.5 ± 0.5 fA/cm{sup 2} when the a-Si:H film thickness exceeds 2.5 nm. The passivation by the sub-nm a-Si:H/SiN{sub x} stack is thermally stable at 400 °C in N{sub 2} for 60 min on all four c-Si surfaces. Capacitance–voltage measurements reveal a reduction in interface defect density and film charge density with an increase in a-Si:H thickness. The nearly transparent sub-nm a-Si:H/SiN{sub x} stack is thus demonstrated to be a promising surface passivation and antireflection coating suitable for all types of surfaces encountered in high efficiency c-Si solar cells.

  4. Effect of La addition on glass-forming ability and stability of mechanically alloyed Zr-Ni amorphous alloys

    International Nuclear Information System (INIS)

    Research highlights: → The minor large atom La addition can improve the glass forming ability of Zr-Ni-La and enhance the stability of the amorphous phase against the mechanically induced crystallization. → The stability of the Zr-Ni-La amorphous phase decreases with increasing La content. → The effect of La addition in contrast with the small atomic size C addition plays a significant role in promoting the stability of the amorphous phase. → We try to systematically discuss the reasons of La addition effect on GFA and stability of the amorphous phase from three factor of negative heat of mixing, distance between neighboring atoms and atomic size mismatch, respectively. - Abstract: In this study, the role of La in the microstructural evolution of Zr66.7-xNi33.3Lax (x = 1, 3, 5 at.%) alloys during mechanical alloying has been investigated using X-ray diffraction (XRD), transmission electron microscopy (TEM) and differential scanning calorimetry (DSC). The results show that the single amorphous phase of Zr-Ni-La can be obtained through mechanical alloying. The minor La addition can improve the glass forming ability of Zr-Ni-La, enhance the mechanical stability of the amorphous phase against the mechanically induced crystallization and lead to an altered crystallization mode of Zr-Ni alloy. Moreover, the stability of the Zr-Ni-La amorphous phase decreases with further increasing La content. The best effect is obtained for the Zr65.7Ni33.3La1 alloy. Additionally, the effect of La addition in contrast with the small atomic size C addition plays a more significant role in promoting the stability of the amorphous phase. In addition, the reasons of La addition effect on GFA and stability have also been discussed from three factors of negative heat of mixing, distance between neighboring atoms and atomic size mismatch, respectively.

  5. On amorphization and nanocomposite formation in Al–Ni–Ti system by mechanical alloying

    Indian Academy of Sciences (India)

    K Das; G K Dey; B S Murty; S K Pabi

    2005-11-01

    Amorphous structure generated by mechanical alloying (MA) is often used as a precursor for generating nanocomposites through controlled devitrification. The amorphous forming composition range of ternary Al–Ni–Ti system was calculated using the extended Miedema's semi-empirical model. Eleven compositions of this system showing a wide range of negative enthalpy of mixing (− mix) and amorphization (− amor) of the constituent elements were selected for synthesis by MA. The Al88Ni6Ti6 alloy with relatively small negative mix (−0.4 kJ/mol) and amor (−14.8 kJ/mol) became completely amorphous after 120 h of milling, which is possibly the first report of complete amorphization of an Al-based rare earth element free Al–TM–TM system (TM = transition metal) by MA. The alloys of other compositions selected had much more negative mix and amor; but they yielded either nanocomposites of partial amorphous and crystalline structure or no amorphous phase at all in the as-milled condition, evidencing a high degree of stability of the intermetallic phases under the MA environment. Hence, the negative mix and amor are not so reliable for predicting the amorphization in the present system by MA.

  6. The properties of silicon alloyed ferritic ductile irons

    OpenAIRE

    Z. Glavas; A. Strkalj; A. Stojakovic

    2016-01-01

    In this paper the influence of silicon content of 3,1 to 5,4 wt. % on the tensile properties, hardness and impact energy of ferritic ductile iron was analysed. It was found that silicon strengthens the ferrite, resulting in an increase in yield strength and tensile strength with increasing silicon content up to 4,22 wt. %. Elongation and impact energy decreases and the hardness increases with increasing silicon content. Since ferritic ductile irons alloyed and strengthened by silicon have a h...

  7. Formation mechanism of amorphous Ni-Fe-P alloys by electrodeposition

    Institute of Scientific and Technical Information of China (English)

    GAO Cheng-hui

    2005-01-01

    The formation mechanism of the amorphous Ni-Fe-P coating was studied by analysis of the forming thermodynamics, dynamics, and crystallography of the amorphous alloy. The results show that, in the initial stage of deposition a thin "crystal epitaxial growth" layer first forms, and then transforms to amorphous gradually. The cross section in Ni-Fe-P coatings by electrolytic etching exhibits a banded structure of alternate dark and light bands. It is proposed that the banded structure is caused by a change in the P content with thickness,which is due to alternated depletion and enrichment of [OH-] in the diffusion layer resulting from the generation and evolution of hydrogen gas. The amorphous Ni-Fe-P coating will be formed in proper composition, high nucleation rate and strongly hindered growth of the crystal nucleus. Amorphous Ni-Fe-P alloys form as islands, and grow up by layer.

  8. Amorphous TM1−xBx alloy particles prepared by chemical reduction (invited)

    DEFF Research Database (Denmark)

    Linderoth, Søren; Mørup, Steen

    1991-01-01

    Amorphous transition-metal boron (TM-B) alloy particles can be prepared by chemical reduction of TM ions by borohydride in aqueous solutions. ln the last few years systematic studies of the parameters which control the composition, and, in turn, many of the properties of the alloy particles, have...... been performed and are reviewed in the present paper. The most important preparation parameters which influence the composition are the concentration of the borohydride solution and the pH of the TM salt solution. By controlling these parameters it is possible to prepare amorphous alloy samples...

  9. SOLUBILITY OF SILICON IN CAST ALUMINIUM ALLOY AFTER ELECTROHYDROPULSE TREATMENT

    OpenAIRE

    Dyachenko, S.; Fedchenko, N.

    2006-01-01

    The structure of cast aluminium alloy AЛ9 exposed to electrohydropulse treatment (EHPT) was studied. It has been shown that after EHPT solubility of silicon in alloy matrix was increased. With the help of thermodynemic analysis the structural changes in metal after EHPT were explained.

  10. Evidence for cascade overlap and grain boundary enhanced amorphization in silicon carbide irradiated with Kr ions

    International Nuclear Information System (INIS)

    Evolution of amorphous domains in silicon carbide with 1 MeV Kr2+ irradiation is investigated using high-resolution transmission electron microscopy and simulations. An unusual morphology of highly curved crystalline/amorphous boundaries is observed in the images, which is identified as a result of cascade overlap and reproduced by a coarse-grained model informed by atomistic simulations. Comparison of local amorphization fractions near grain boundaries and within grain interiors provides experimental evidence for the interstitial starvation mechanism in SiC for the first time. As a competing effect to defect sinks, interstitial starvation increases the rate of local amorphization near grain boundaries and reduces the radiation resistance of nanocrystalline silicon carbide

  11. Low-temperature, vapor-liquid-solid, laterally grown silicon films using alloyed catalysts

    Science.gov (United States)

    LeBoeuf, Jerome L.; Brodusch, Nicolas; Gauvin, Raynald; Quitoriano, Nathaniel J.

    2014-12-01

    Using amorphous oxide templates known as micro-crucibles which confine a vapor-liquid-solid catalyst to a specific geometry, two-dimensional silicon thin-films of a single orientation have been grown laterally over an amorphous substrate and defects within crystals have been necked out. The vapor-liquid-solid catalysts consisted nominally of 99% gold with 1% titanium, chromium, or aluminum, and each alloy affected the processing of micro-crucibles and growth within them significantly. It was found that chromium additions inhibited the catalytic effect of the gold catalysts, titanium changed the morphology of the catalyst during processing and aluminum stabilized a potential third phase in the gold-silicon system upon cooling. Two mechanisms for growing undesired nanowires were identified both of which hindered the VLS film growth, fast silane cracking rates and poor gold etching, which left gold nanoparticles near the gold-vapor interface. To reduce the silane cracking rates, growth was done at a lower temperature while an engineered heat and deposition profile helped to reduce NWs caused by the second mechanism. Through experimenting with catalyst compositions, the fundamental mechanisms which produce concentration gradients across the gold-silicon alloy within a given micro-crucible have been proposed. Using the postulated mechanisms, micro-crucibles were designed which promote high-quality, single crystal growth of semiconductors.

  12. Effect of light trapping in an amorphous silicon solar cell

    International Nuclear Information System (INIS)

    Light trapping in amorphous silicon based solar cell has been investigated theoretically. The substrate for these cells can be textured, including pyramidally textured c-Si wafer, to improve capture of incident light. A thin silver layer, deposited on the substrate of an n–i–p cell, ultimately goes at the back of the cell structure and can act a back reflector to improve light trapping. The two physical solar cells we investigated had open circuit voltages (Voc) of 0.87, 0.90 V, short circuit current densities (Jsc) of 14.2, 15.36 mA/cm2 respectively. The first cell was investigated for the effect on its performance while having and not having light trapping scheme (LT), when thickness of the active layer (di) was changed in the range of 100 nm to 800 nm. In both the approaches, for having or not having LT, the short circuit current density increases with di while the Voc and fill factor, decreases steadily. However, maximum cell efficiency can be obtained when di = 400 nm, and hence it was considered optimized thickness of the active layer, that was used for further investigation. With the introduction of light trapping to the second cell, it shows a further enhancement in Jsc and red response of the external quantum efficiency to 16.6 mA/cm2 and by 11.1% respectively. Considering multiple passages of light inside the cell, we obtained an improvement in cell efficiency from 9.7% to 10.6%. - Highlights: • A theoretical analysis of light trapping in p–i–n and n–i–p type solar cells • Jsc increases and Voc decreases with the increase in i-layer thickness. • Observed optimized thickness of i-layer as 400 nm • Jsc improved from 15.4 mA/cm2 to 16.6 mA/cm2 due to the light trapping. • Efficiency (η) improved from 9.7% to 10.6% due to better red response of the EQE

  13. Effect of light trapping in an amorphous silicon solar cell

    Energy Technology Data Exchange (ETDEWEB)

    Iftiquar, S.M., E-mail: iftiquar@skku.edu [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Jung, Juyeon; Park, Hyeongsik [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Cho, Jaehyun; Shin, Chonghoon [Department of Energy Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Park, Jinjoo [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Jung, Junhee [Department of Energy Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Bong, Sungjae [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Kim, Sunbo [Department of Energy Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Yi, Junsin, E-mail: yi@yurim.skku.ac.kr [College of Information and Communication Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of); Department of Energy Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

    2015-07-31

    Light trapping in amorphous silicon based solar cell has been investigated theoretically. The substrate for these cells can be textured, including pyramidally textured c-Si wafer, to improve capture of incident light. A thin silver layer, deposited on the substrate of an n–i–p cell, ultimately goes at the back of the cell structure and can act a back reflector to improve light trapping. The two physical solar cells we investigated had open circuit voltages (V{sub oc}) of 0.87, 0.90 V, short circuit current densities (J{sub sc}) of 14.2, 15.36 mA/cm{sup 2} respectively. The first cell was investigated for the effect on its performance while having and not having light trapping scheme (LT), when thickness of the active layer (d{sub i}) was changed in the range of 100 nm to 800 nm. In both the approaches, for having or not having LT, the short circuit current density increases with d{sub i} while the V{sub oc} and fill factor, decreases steadily. However, maximum cell efficiency can be obtained when d{sub i} = 400 nm, and hence it was considered optimized thickness of the active layer, that was used for further investigation. With the introduction of light trapping to the second cell, it shows a further enhancement in J{sub sc} and red response of the external quantum efficiency to 16.6 mA/cm{sup 2} and by 11.1% respectively. Considering multiple passages of light inside the cell, we obtained an improvement in cell efficiency from 9.7% to 10.6%. - Highlights: • A theoretical analysis of light trapping in p–i–n and n–i–p type solar cells • J{sub sc} increases and V{sub oc} decreases with the increase in i-layer thickness. • Observed optimized thickness of i-layer as 400 nm • J{sub sc} improved from 15.4 mA/cm{sup 2} to 16.6 mA/cm{sup 2} due to the light trapping. • Efficiency (η) improved from 9.7% to 10.6% due to better red response of the EQE.

  14. Friction and wear behavior of electrodeposited amorphous Fe-Co-W alloy deposits

    Institute of Scientific and Technical Information of China (English)

    何凤姣; 雷惊天; 陆欣; 黄宇宁

    2004-01-01

    The microstructures, friction and wear behavior under dry sliding condition of electrodeposited amorphous Fe-Co-W alloy deposits heat treated at different temperatures were studied. A comparative study of hard chrome deposit under the same testing condition was also made. The experimental results show that the hardness and wear resistance of amorphous Fe-Co-W alloy deposits are improved with the increasing of heat treatment temperature, and reach the maximum value at 800 ℃, then decrease above 800 ℃. Under 40 N load, the wear resistance properties of the alloy deposits heat treated at 800 ℃ are superior to those of hard chrome deposit. The main wear mechanisms of amorphous Fe-Co-W alloy deposits heat treated below 600 ℃ are peeling, plastic and flowing deformation; when the deposits are heat treated above 700 ℃, they are plastic and flowing deformation. While the main wear mechanisms of hard chrome are abrasive wear, fatigue and peeling.

  15. Substrate and Passivation Techniques for Flexible Amorphous Silicon-Based X-ray Detectors

    Directory of Open Access Journals (Sweden)

    Michael A. Marrs

    2016-07-01

    Full Text Available Flexible active matrix display technology has been adapted to create new flexible photo-sensing electronic devices, including flexible X-ray detectors. Monolithic integration of amorphous silicon (a-Si PIN photodiodes on a flexible substrate poses significant challenges associated with the intrinsic film stress of amorphous silicon. This paper examines how altering device structuring and diode passivation layers can greatly improve the electrical performance and the mechanical reliability of the device, thereby eliminating one of the major weaknesses of a-Si PIN diodes in comparison to alternative photodetector technology, such as organic bulk heterojunction photodiodes and amorphous selenium. A dark current of 0.5 pA/mm2 and photodiode quantum efficiency of 74% are possible with a pixelated diode structure with a silicon nitride/SU-8 bilayer passivation structure on a 20 µm-thick polyimide substrate.

  16. Infrared Insight into the Network of Hydrogenated Amorphous and Polycrystalline Silicon thin Films

    Directory of Open Access Journals (Sweden)

    Jarmila Mullerova

    2006-01-01

    Full Text Available IR measurements were carried out on both amorphous and polycrystalline silicon samples deposited by PECVDon glass substrate. The transition from amorphous to polycrystalline phase was achieved by increasing dilution of silaneplasma at the deposition process. The samples were found to be mixed phase materials. Commonly, infrared spectra ofhydrogenated silicon thin films yield information about microstructure, hydrogen content and hydrogen bonding to silicon. Inthis paper, additional understanding was retrieved from infrared response. Applying standard optical laws, effective mediatheory and Clausius-Mossoti approach concerning the Si-Si and Si-H bonds under IR irradiation as individual oscillators,refractive indices in the long wavelength limit, crystalline, amorphous and voids volume fractions and the mass density of thefilms were determined. The mass density was found to decrease with increasing crystalline volume fraction, which can beattributed to the void-dominated mechanism of network formation.

  17. Substrate and Passivation Techniques for Flexible Amorphous Silicon-Based X-ray Detectors.

    Science.gov (United States)

    Marrs, Michael A; Raupp, Gregory B

    2016-01-01

    Flexible active matrix display technology has been adapted to create new flexible photo-sensing electronic devices, including flexible X-ray detectors. Monolithic integration of amorphous silicon (a-Si) PIN photodiodes on a flexible substrate poses significant challenges associated with the intrinsic film stress of amorphous silicon. This paper examines how altering device structuring and diode passivation layers can greatly improve the electrical performance and the mechanical reliability of the device, thereby eliminating one of the major weaknesses of a-Si PIN diodes in comparison to alternative photodetector technology, such as organic bulk heterojunction photodiodes and amorphous selenium. A dark current of 0.5 pA/mm² and photodiode quantum efficiency of 74% are possible with a pixelated diode structure with a silicon nitride/SU-8 bilayer passivation structure on a 20 µm-thick polyimide substrate. PMID:27472329

  18. Applications of microcrystalline hydrogenated cubic silicon carbide for amorphous silicon thin film solar cells

    International Nuclear Information System (INIS)

    We demonstrated the fabrication of n-i-p type amorphous silicon (a-Si:H) thin film solar cells using phosphorus doped microcrystalline cubic silicon carbide (μc-3C-SiC:H) films as a window layer. The Hot-wire CVD method and a covering technique of titanium dioxide TiO2 on TCO was utilized for the cell fabrication. The cell configuration is TCO/TiO2/n-type μc-3C-SiC:H/intrinsic a-Si:H/p-type μc- SiCx (a-SiCx:H including μc-Si:H phase)/Al. Approximately 4.5% efficiency with a Voc of 0.953 V was obtained for AM-1.5 light irradiation. We also prepared a cell with the undoped a-Si1-xCx:H film as a buffer layer to improve the n/i interface. A maximum Voc of 0.966 V was obtained

  19. Crystallographic orientation-spray formed hypereutectic aluminium-silicon alloys

    OpenAIRE

    Hamilta de Oliveira Santos; Marilene Morelli Serna; Nelson Batista de Lima; Isolda Costa; Jesualdo Luiz Rossi

    2005-01-01

    Aluminium-silicon alloys have been wide accepted in the automotive, electric and aerospace industries. Preferred orientation is a very common condition for metals and alloys. Particularly, aluminium induces texture during the forming process. The preparation of an aggregate with completely random crystal orientation is a difficult task. The present work was undertaken to analyse the texture by X-ray diffraction techniques, of three spray formed hypereutectic Al-Si alloys. Samples were taken f...

  20. Hydrogenated Amorphous Silicon Germanium Active Layer for Top Cell of a Multi Junction Cell Structure.

    Science.gov (United States)

    Cho, Jaehyun; Iftiquar, S M; Kim, Minbum; Park, Jinjoo; Jung, Junhee; Kim, Jiwoong; Yi, Junsin

    2016-05-01

    Intrinsic hydrogenated amorphous silicon-germanium (a-SiGe:H) alloy is generally used in the bottom cell because of its low band gap. The a-SiGe:H has a higher photo conductivity in comparison to the a-Si:H; thus, it is expected that the a-SiGe:H can show better short circuit current density than that of the a-Si:H based solar cell. Therefore, we optimized a-SiGe:H active layer that can be a suitable choice for the front cell of a multi junction.solar cell. Furthermore, we carried out a comparative study of the solar cells that have a-SiGe:H and a-Si:H as respective active layers. The a-SiGe:H based solar cells show higher short circuit current density, while the a-Si:H based cells show higheropen circuit voltage. The current-voltage characteristics of these cells are as follows: (a) V(oc) = 770 mV, J(sc) = 15.0 mA/cm2, FF = 64.5%, and η = 7.47% for a-SiGe:H based cell; and (b) V(oc) = 826 mV, J(sc) = 13.63 mA/cm2, FF = 72.0%, and η = 8.1% for a-Si:H based cell. PMID:27483837

  1. Programmable SERS active substrates for chemical and biosensing applications using amorphous/crystalline hybrid silicon nanomaterial

    OpenAIRE

    Jeffery Alexander Powell; Krishnan Venkatakrishnan; Bo Tan

    2016-01-01

    We present the creation of a unique nanostructured amorphous/crystalline hybrid silicon material that exhibits surface enhanced Raman scattering (SERS) activity. This nanomaterial is an interconnected network of amorphous/crystalline nanospheroids which form a nanoweb structure; to our knowledge this material has not been previously observed nor has it been applied for use as a SERS sensing material. This material is formed using a femtosecond synthesis technique which facilitates a laser plu...

  2. Electrical properties of amorphous chalcogenide/silicon heterojunctions modified by ion implantation

    OpenAIRE

    Fedorenko, Yanina G.; Hughes, Mark A.; Colaux, Julien L.; Jeynes, C.; Gwilliam, Russell M.; Homewood, Kevin P.; Yao, Jin; Hewak, Dan W.; Lee, Tae-Hoon; Elliott, Stephen R; Gholipour, B.; Curry, Richard J.

    2014-01-01

    Doping of amorphous chalcogenide films of rather dissimilar bonding type and resistivity, namely, Ga-La-S, GeTe, and Ge-Sb-Te by means of ion implantation of bismuth is considered. To characterize defects induced by ion-beam implantation space-charge-limited conduction and capacitance-voltage characteristics of amorphous chalcogenide/silicon heterojunctions are investigated. It is shown that ion implantation introduces substantial defect densities in the films and their interfaces with silico...

  3. Direct simulation of ion beam induced stressing and amorphization of silicon

    OpenAIRE

    Beardmore, Keith M.; Gronbech-Jensen, Niels

    1999-01-01

    Using molecular dynamics (MD) simulation, we investigate the mechanical response of silicon to high dose ion-irradiation. We employ a realistic and efficient model to directly simulate ion beam induced amorphization. Structural properties of the amorphized sample are compared with experimental data and results of other simulation studies. We find the behavior of the irradiated material is related to the rate at which it can relax. Depending upon the ability to deform, we observe either the ge...

  4. Spectroscopic Ellipsometry Studies of n-i-p Hydrogenated Amorphous Silicon Based Photovoltaic Devices

    OpenAIRE

    Laxmi Karki Gautam; Maxwell M. Junda; Hamna F. Haneef; Collins, Robert W.; Nikolas J. Podraza

    2016-01-01

    Optimization of thin film photovoltaics (PV) relies on characterizing the optoelectronic and structural properties of each layer and correlating these properties with device performance. Growth evolution diagrams have been used to guide production of materials with good optoelectronic properties in the full hydrogenated amorphous silicon (a-Si:H) PV device configuration. The nucleation and evolution of crystallites forming from the amorphous phase were studied using in situ near-infrared to u...

  5. Amorphous and nanocrystalline phase formation in highly-driven Al-based binary alloys

    Energy Technology Data Exchange (ETDEWEB)

    Kalay, Yunus Eren [Iowa State Univ., Ames, IA (United States)

    2009-01-01

    Remarkable advances have been made since rapid solidification was first introduced to the field of materials science and technology. New types of materials such as amorphous alloys and nanostructure materials have been developed as a result of rapid solidification techniques. While these advances are, in many respects, ground breaking, much remains to be discerned concerning the fundamental relationships that exist between a liquid and a rapidly solidified solid. The scope of the current dissertation involves an extensive set of experimental, analytical, and computational studies designed to increase the overall understanding of morphological selection, phase competition, and structural hierarchy that occurs under far-from equilibrium conditions. High pressure gas atomization and Cu-block melt-spinning are the two different rapid solidification techniques applied in this study. The research is mainly focused on Al-Si and Al-Sm alloy systems. Silicon and samarium produce different, yet favorable, systems for exploration when alloyed with aluminum under far-from equilibrium conditions. One of the main differences comes from the positions of their respective T0 curves, which makes Al-Si a good candidate for solubility extension while the plunging T0 line in Al-Sm promotes glass formation. The rapidly solidified gas-atomized Al-Si powders within a composition range of 15 to 50 wt% Si are examined using scanning and transmission electron microscopy. The non-equilibrium partitioning and morphological selection observed by examining powders at different size classes are described via a microstructure map. The interface velocities and the amount of undercooling present in the powders are estimated from measured eutectic spacings based on Jackson-Hunt (JH) and Trivedi-Magnin-Kurz (TMK) models, which permit a direct comparison of theoretical predictions. For an average particle size of 10 {micro}m with a Peclet number of ~0.2, JH and TMK deviate from

  6. Amorphous and nanocrystalline phase formation in highly-driven Al-based binary alloys

    International Nuclear Information System (INIS)

    Remarkable advances have been made since rapid solidification was first introduced to the field of materials science and technology. New types of materials such as amorphous alloys and nanostructure materials have been developed as a result of rapid solidification techniques. While these advances are, in many respects, ground breaking, much remains to be discerned concerning the fundamental relationships that exist between a liquid and a rapidly solidified solid. The scope of the current dissertation involves an extensive set of experimental, analytical, and computational studies designed to increase the overall understanding of morphological selection, phase competition, and structural hierarchy that occurs under far-from equilibrium conditions. High pressure gas atomization and Cu-block melt-spinning are the two different rapid solidification techniques applied in this study. The research is mainly focused on Al-Si and Al-Sm alloy systems. Silicon and samarium produce different, yet favorable, systems for exploration when alloyed with aluminum under far-from equilibrium conditions. One of the main differences comes from the positions of their respective T0 curves, which makes Al-Si a good candidate for solubility extension while the plunging T0 line in Al-Sm promotes glass formation. The rapidly solidified gas-atomized Al-Si powders within a composition range of 15 to 50 wt% Si are examined using scanning and transmission electron microscopy. The non-equilibrium partitioning and morphological selection observed by examining powders at different size classes are described via a microstructure map. The interface velocities and the amount of undercooling present in the powders are estimated from measured eutectic spacings based on Jackson-Hunt (JH) and Trivedi-Magnin-Kurz (TMK) models, which permit a direct comparison of theoretical predictions. For an average particle size of 10 (micro)m with a Peclet number of ∼0.2, JH and TMK deviate from each other. This

  7. Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix.

    Science.gov (United States)

    Yamada, Shigeru; Kurokawa, Yasuyoshi; Miyajima, Shinsuke; Konagai, Makoto

    2014-01-01

    We investigate the effects of hydrogen plasma treatment (HPT) on the properties of silicon quantum dot superlattice films. Hydrogen introduced in the films efficiently passivates silicon and carbon dangling bonds at a treatment temperature of approximately 400°C. The total dangling bond density decreases from 1.1 × 1019 cm-3 to 3.7 × 1017 cm-3, which is comparable to the defect density of typical hydrogenated amorphous silicon carbide films. A damaged layer is found to form on the surface by HPT; this layer can be easily removed by reactive ion etching. PMID:24521208

  8. Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix

    OpenAIRE

    Yamada, Shigeru; Kurokawa, Yasuyoshi; Miyajima, Shinsuke; KONAGAI, MAKOTO

    2014-01-01

    We investigate the effects of hydrogen plasma treatment (HPT) on the properties of silicon quantum dot superlattice films. Hydrogen introduced in the films efficiently passivates silicon and carbon dangling bonds at a treatment temperature of approximately 400°C. The total dangling bond density decreases from 1.1 × 1019 cm-3 to 3.7 × 1017 cm-3, which is comparable to the defect density of typical hydrogenated amorphous silicon carbide films. A damaged layer is found to form on the surface by ...

  9. Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix

    Science.gov (United States)

    Yamada, Shigeru; Kurokawa, Yasuyoshi; Miyajima, Shinsuke; Konagai, Makoto

    2014-02-01

    We investigate the effects of hydrogen plasma treatment (HPT) on the properties of silicon quantum dot superlattice films. Hydrogen introduced in the films efficiently passivates silicon and carbon dangling bonds at a treatment temperature of approximately 400°C. The total dangling bond density decreases from 1.1 × 1019 cm-3 to 3.7 × 1017 cm-3, which is comparable to the defect density of typical hydrogenated amorphous silicon carbide films. A damaged layer is found to form on the surface by HPT; this layer can be easily removed by reactive ion etching.

  10. Amorphous NEA Silicon Photocathodes - A Robust RF Gun Electron Source. Final Report

    International Nuclear Information System (INIS)

    Amorphous silicon (a-Si) has been shown to have great promise as a negative electron affinity visible wavelength photocathode suitable for radio frequency (RF) gun systems. The specific operating wavelength can be shifted by growing it as a germanium alloy (a-Si(1-x)Ge(x)) rather than as pure silicon. This class of photoemitters has been shown to possess a high degree of immunity to charged particle flux. Such particle flux can be a significant problem in the operation of other photocathodes in RF gun systems. Its emission characteristics in the form of current per unit area, or current density, and emission angle, or beam spread are well matched for use in RF guns. Photocathodes made of a-Si can be fabricated on a variety of substrates including those most commonly employed in RF gun systems. Such photocathodes can be made for operation in either transmission or reflection mode. By growing them utilizing radio frequency plasma enhanced chemical vapor deposition, the unit cost is quite low, the quality is high and it is straightforward to grow custom size substrates and full or limited regions to confine the electron emission to the desired area. Quality emitters have been fabricated on tantalum, molybdenum, tungsten, titanium, copper, stainless steel, float glass, borosilicate glass and gallium arsenide. In addition to performing well in dedicated test chambers, a-Si photocathodes have been shown to function well in self-contained vacuum tubes. In this employment, they are subjected to a strenuous environment. Successful operation in this configuration provides additional confidence in their application to high energy linac photoinjectors and potentially as part of reliable, low cost photocathode driven RF gun systems that could become ready replacements for the diode and triode guns used on medical accelerators. Their applications in stand-alone vacuum tubes is just beginning to be explored.

  11. In situ spectroellipsometric study of the nucleation and growth of amorphous silicon

    Science.gov (United States)

    Canillas, A.; Bertran, E.; Andújar, J. L.; Drévillon, B.

    1990-09-01

    A detailed in situ spectroellipsometric analysis of the nucleation and growth of hydrogenated amorphous silicon (a:Si:H) is presented. Photoelectronic quality a-Si:H films are deposited by plasma-enhanced chemical vapor deposition on smooth metal (NiCr alloy) and crystalline silicon (c-Si) substrates. The deposition of a-Si:H is analyzed from the first monolayer up to a final thickness of 1.2 μm. In order to perform an improved analysis, real time ellipsometric trajectories are recorded, using fixed preparation conditions, at various photon energies ranging from 2.2 to 3.6 eV. The advantage of using such a spectroscopic experimental procedure is underlined. New insights into the nucleation and growth mechanisms of a-Si:H are obtained. The nucleation mechanism on metal and c-Si substrates is very accurately described assuming a columnar microstructural development during the early stage of the growth. Then, as a consequence of the incomplete coalescence of the initial nuclei, a surface roughness at the 10-15 Å scale is identified during the further growth of a-Si:H on both substrates. The bulk a-Si:H grows homogeneously beneath the surface roughness. Finally, an increase of the surface roughness is evidenced during the long term growth of a-Si:H. However, the nature of the substrate influenced the film growth. In particular, the film thickness involved in the nucleation-coalescence phase is found lower in the case of c-Si (67±8 Å) as compared to NiCr (118±22 Å). Likewise films deposited on c-Si present a smaller surface roughness even if thick samples are considered (>1 μm). More generally, the present study illustrates the capability of in situ spectroellipsometry to precisely analyze fundamental processes in thin-film growth, but also to monitor the preparation of complex structures on a few monolayers scale.

  12. Amorphous silicon sensor arrays for X-ray and document imaging

    International Nuclear Information System (INIS)

    Large area amorphous silicon image sensor arrays are important for X-ray medical imaging and document scanning as well as a variety of other applications where large sensor size is required. The paper first summarizes the present state of the flat panel X-ray imager technology, and compares the two main approaches for X-ray detection. The authors then describe the performance of a new, large area, high resolution, radiographic imager based o a single amorphous silicon array with 2,304 x 3,200 pixels, and an active area of 30 x 40 cm (12 x 16 inches)

  13. Light-induced Voc increase and decrease in high-efficiency amorphous silicon solar cells

    OpenAIRE

    Stuckelberger, Michael; Riesen, Yannick Samuel; Despeisse, Matthieu; Schüttauf, Jan-Willem Alexander; Haug, Franz-Josef; Ballif, Christophe

    2014-01-01

    High-efficiency amorphous silicon (a-Si:H) solar cells were deposited with different thicknesses of the p-type amorphous silicon carbide layer on substrates of varying roughness. We observed a light-induced open-circuit voltage (Voc) increase upon light soaking for thin p-layers, but a decrease for thick p-layers. Further, the Voc increase is enhanced with increasing substrate roughness. After correction of the p-layer thickness for the increased surface area of rough substrates, we can exclu...

  14. Rare-earth Doped Amorphous Silicon Microdisk and Microstadium Resonators with Emission at 1550nm

    CERN Document Server

    Figueira, D S L

    2007-01-01

    Microdisks and microstadium resonators were fabricated on erbium doped amorphous hydrogenated silicon (a-Si:H) layers sandwiched in air and native SiO2 on Si substrates. Annealing condition is optimized to allow large emission at 1550 nm for samples with erbium concentrations as high as 1.02x10^20 atoms/cm3. Near field scanning optical microscopy shows evidences of the simultaneous presence of bow-tie and diamond scars. These modes indicate the high quality of the resonators and the potentiality for achieving amorphous silicon microcavity lasers.

  15. On electronic structure of polymer-derived amorphous silicon carbide ceramics

    Science.gov (United States)

    Wang, Kewei; Li, Xuqin; Ma, Baisheng; Wang, Yiguang; Zhang, Ligong; An, Linan

    2014-06-01

    The electronic structure of polymer-derived amorphous silicon carbide ceramics was studied by combining measurements of temperature-dependent conductivity and optical absorption. By comparing the experimental results to theoretical models, electronic structure was constructed for a carbon-rich amorphous silicon carbide, which revealed several unique features, such as deep defect energy level, wide band-tail band, and overlap between the band-tail band and defect level. These unique features were discussed in terms of the microstructure of the material and used to explain the electric behavior.

  16. The crystallisation of deep amorphous wells in silicon produced by ion implantation

    International Nuclear Information System (INIS)

    The crystallisation of deep amorphous wells is studied. These model systems are formed by high energy self implantation through a mask into silicon. The amorphised regions have an aspect ratio opposite to that employed in previous experiments. At elevated temperatures crystallisation proceeds inwards with the amorphous-phase being transformed through both lateral and vertical solid-phase epitaxy (SPE). Complementary information is obtained from performing plan view and cross-sectional transmission electron microscopy analyses. It is discovered that the recovery of the amorphous material is governed by the dynamics of solid-phase epitaxy and that unique secondary structures result from the heat treatment

  17. Hydrogenated amorphous silicon radiation detectors: Material parameters, radiation hardness, charge collection

    International Nuclear Information System (INIS)

    For nearly two decades now hydrogenated amorphous silicon has generated considerable interest for its potential use in various device applications namely, solar cells, electrolithography, large-area electronics etc. The development of efficient and economic solar cells has been on the forefront of this research. This interest in hydrogenated amorphous silicon has been motivated by the fact that amorphous silicon can be deposited over a large area at relatively low cost compared to crystalline silicon. Hydrogenated amorphous silicon, frequently abbreviated as a-Si:H, used in solar-cell applications is a micron or less thick. The basic device structure is a p-i-n diode where the i layer is the active layer for radiation to interact. This is so because intrinsic a-Si:H has superior electrical properties in comparison to doped a-Si:H which serves the purpose of forming a potential barrier on either end of the i layer. The research presented in this dissertation was undertaken to study the properties of a-Si:H for radiation detection applications in physics and medicine

  18. An amorphous alloy stress sensor for wireless battery-free applications

    Science.gov (United States)

    Bowles, Adrian; Gore, Jon; Tomka, George

    2005-05-01

    Battery-free sensor systems would benefit from the availability of a stress or strain sensor that exhibits a large enough property change to allow simplification and power reductions in sensor interface and data transmission circuitry. A new sensor has been developed specifically for this purpose, which uses the large stress induced impedance changes exhibited by ribbons of amorphous magnetic alloy. In comparison to semiconductor strain gauges, which show a change in resistance of 15% when strained to their maximum recommended stress level, the amorphous alloy sensor demonstrates a change in inductance of 315%, when strained to its maximum working level. Although, amorphous magnetic alloys are inherently sensitive to external magnetic fields, a simple, biasing technique renders the stress-sensing device insensitive to modest field strengths. The amorphous magnetic alloys are produced in large volumes and realize an extremely low cost sensor. A low cost and low power analogue electrical circuit has been designed that, in combination with the amorphous alloy sensor, functions as a battery-free sensor 'tag'. The sensor tag can transmit stress data to a transceiver system via an inductive link, negating the need for battery power or a hardwire connection. The system"s range is directly related to the transceiver and tag antenna dimensions; however a system with 20cm diameter antennas has been demonstrated operating over a range of up to 60cm. This range is achieved through the extremely low power demands of the sensor tag (tyre pressure monitoring applications.

  19. High Energy Storage Mg-based amorphous alloys for nickel-metal hydride battery

    International Nuclear Information System (INIS)

    Full text: Mg-based hydrogen storage alloys possess very high hydrogen absorption capacity (For example, Mg2NiH4 contains 3.6 wt.% of hydrogen). Magnesium is also abundant in nature, light in weight and low in cost. As a result, magnesium alloys have become the subject of increasing research world-wide. For a long period, it was thought that Mg-based alloy-hydrogen systems needed to be operated at high temperature (over 250 deg C) and under high hydrogen pressure. However, in recent years, some research work was successfully done to improve the hydrogen absorption kinetics of Mg2Ni by mechanical grinding and alloying. Some nano and amorphous structured Mg2Ni alloys could absorb hydrogen even at room temperature. Our research results show that it is possible to use Mg2Ni-type alloys as promising materials for increasing the negative electrode capacity of Ni-MH batteries because the theoretical discharge capacity of Mg2Ni alloy is approximately 1000 mAh/g, much higher than that of the main commercial LaNi5 alloy (which has a capacity of only about 370 mAh/g). Mg-based alloy electrodes were manufactured by a powder metallurgical technique or a induction melting method followed by ball milling with Ni and/or other metal powders. The discharge capacities of the Mg-based alloy electrodes were significantly improved by ball milling. An amorphous structure is a key factor in order to achieve high discharge capacities. The figure below shows the ball milled amorphous Mg-based alloy electrodes have very high discharge capacities by comparison with crystalline Mg2Ni alloys or commercial AB5 alloy

  20. Hard rhenium–boron–cobalt amorphous alloys with a wide supercooled liquid region

    International Nuclear Information System (INIS)

    Novel Re–B–Co amorphous alloys with compositions of Re65−xB35Cox (at%, x=25, 30, 35, 40, 45, and 50) were fabricated by single-roller melt spinning. These alloys were found to exhibit a clear glass transition phenomenon. The width of supercooled liquid region (ΔTx) is in the range of 52–71 K. Such a large ΔTx allows us to produce amorphous alloy bulks by thermoplastic forming. The Vickers hardness is up to 19.10 GPa for the Re40B35Co25 alloy, which is close to that reported for some hard covalent crystals. Thus, the present alloys with a combination of large ΔTx and high hardness are expected to be used as a new type of structural materials. Furthermore, the relationships of hardness with glass transition temperature and Young's modulus were also discussed

  1. Proton irradiation effects of amorphous silicon solar cell for solar power satellite

    Energy Technology Data Exchange (ETDEWEB)

    Morita, Yousuke; Oshima, Takeshi [Japan Atomic Energy Research Inst., Takasaki, Gunma (Japan). Takasaki Radiation Chemistry Research Establishment; Sasaki, Susumu; Kuroda, Hideo; Ushirokawa, Akio

    1997-03-01

    Flexible amorphous silicon(fa-Si) solar cell module, a thin film type, is regarded as a realistic power generator for solar power satellite. The radiation resistance of fa-Si cells was investigated by the irradiations of 3,4 and 10 MeV protons. The hydrogen gas treatment of the irradiated fa-Si cells was also studied. The fa-Si cell shows high radiation resistance for proton irradiations, compared with a crystalline silicon solar cell. (author)

  2. Computational Evaluation of Amorphous Carbon Coating for Durable Silicon Anodes for Lithium-Ion Batteries

    OpenAIRE

    Jeongwoon Hwang; Jisoon Ihm; Kwang-Ryeol Lee; Seungchul Kim

    2015-01-01

    We investigate the structural, mechanical, and electronic properties of graphite-like amorphous carbon coating on bulky silicon to examine whether it can improve the durability of the silicon anodes of lithium-ion batteries using molecular dynamics simulations and ab-initio electronic structure calculations. Structural models of carbon coating are constructed using molecular dynamics simulations of atomic carbon deposition with low incident energies (1–16 eV). As the incident energy decrease...

  3. Effect of phosphorus ion implantation on crystallization of amorphous silicon films under exposure to excimer laser radiation pulses

    International Nuclear Information System (INIS)

    The effect of implanted phosphorus ions on the crystallization of thin amorphous silicon films under the action of nanosecond radiation pulses of a XeCl excimer laser is studied. The amorphous silicon films with a thickness of 90 nm on glass substrates, were implanted with phosphorus ions at a dose of 3 x 1014 and 3 x 1015 cm-2. The subsequent laser treatments were performed using energies both above and below a threshold corresponding to the fusion of amorphous silicon. The structure of the silicon films was studied using Raman spectroscopy. The conclusion is made that implanted phosphorus stimulates nucleation, especially in the case of liquid phase crystallization

  4. Effect of Viscosity on the Microformability of Bulk Amorphous Alloy in Supercooled Liquid Region

    International Nuclear Information System (INIS)

    Previously published results have shown that viscosity greatly influences on the deformation behavior of the bulk amorphous alloy in supercooled liquid region during microforming process. And viscosity is proved to be a component of the evaluation index which indicating microformability. Based on the fluid flow theory and assumptions, bulk amorphous alloy can be regarded as the viscous materials with a certain viscosity. It is helpful to understand how the viscosity plays an important role in viscous materials with various viscosities by numerical simulation on the process. Analysis is carried out by linear state equation in FEM with other three materials, water, lubricant oil and polymer melt, whose viscosities are different obviously. The depths of the materials flow into the U-shaped groove during the microimprinting process are compared in this paper. The result shows that the deformation is quite different when surface tension effect is not considered in the case. With the lowest viscosity, water can reach the bottom of micro groove in a very short time. Lubricant oil and polymer melt slower than it. Moreover bulk amorphous alloys in supercooled liquid state just flow into the groove slightly. Among the alloys of different systems including Pd-, Mg- and Zr-based alloy, Pd-based alloy ranks largest in the depth. Mg-based alloy is the second. And Zr-based alloy is the third. Further more the rank order of the viscosities of the alloys is Pd-, Mg- and Zr-based. It agrees well with the results of calculation. Therefore viscosity plays an important role in the microforming of the bulk amorphous alloy in the supercooled liquid state.

  5. Field Emission from Amorphous carbon Nitride Films Deposited on silicon Tip Arrays

    Institute of Scientific and Technical Information of China (English)

    李俊杰; 郑伟涛; 孙龙; 卞海蛟; 金曾孙; 赵海峰; 宋航; 孟松鹤; 赫晓东; 韩杰才

    2003-01-01

    Amorphous carbon nitride films (a-CNx) were deposited on silicon tip arrays by rf magnetron sputtering in pure nitrogen atmosphere. The field emission property of carbon nitride films on Si tips was compared with that of carbon nitride on silicon wafer. The results show that field emission property of carbon nitride films deposited on silicon tips can be improved significantly in contrast with that on wafer. It can be explained that field emission is sensitive to the local curvature and geometry, thus silicon tips can effectively promote field emission property of a-CNx films. In addition, the films deposited on silicon tips have a smaller effective work function ( F = 0.024 eV)of electron field emission than that on silicon wafer ( F = 0.060 e V), which indicates a significant enhancement of the ability of electron field emission from a-CNx films.

  6. Crystal-amorphous-silicon interface kinetics under ion beam irradiation

    Science.gov (United States)

    Priolo, F.; La Ferla, A.; Spinella, C.; Rimini, E.; Campisano, S. U.; Ferla, G.

    1990-01-01

    Our recent work on ion-beam-assisted epitaxial growth of amorphous Si layers on single crystal substrates is reviewed. The crystallization was induced by a 600 keV Kr2+ beam at a dose rate of 1×1012/cm2 · s. During irradiations the samples were mounted on a resistively heated copper block whose temperature was maintained constant in the range 250-450°C. The planar motion of the crystal-amorphous interface was monitored in situ by dynamic reflectivity measurements. This technique allows the ion-induced growth rate to be measured with a very high precision. We have observed that this growth rate scales linearly with the energy deposited into elastic collisions at the crystal-amorphous interface by the impinging ions. Moreover, the rate shows an Arrhenius temperature dependence with a well defined activation energy of 0.32±0.05 eV. The dependence of this process on substrate orientation and on impurities either dissolved in the amorphous layer or present at very high concentration at the crystal-amorphous interface is also discussed.

  7. Crystalline-amorphous silicon nano-composites: Nano-pores and nano-inclusions impact on the thermal conductivity

    Science.gov (United States)

    Verdier, M.; Termentzidis, K.; Lacroix, D.

    2016-05-01

    The thermal conductivities of nanoporous and nanocomposite silicon with incorporated amorphous phases have been computed by molecular dynamics simulations. A systematic investigation of the porosity and the width of the amorphous shell contouring a spherical pore has been made. The impact of amorphous phase nanoinclusions in a crystalline matrix has also been studied with the same amorphous fraction as the porosity of nanoporous silicon to achieve comparison. The key parameter for all configurations with or without the amorphous phase is proved to be the interface (between the crystalline and amorphous phases or crystalline and void) to volume ratio. We obtain the sub-amorphous thermal conductivity for several configurations by combining pores, amorphous shell, and crystalline phase. These configurations are promising candidates for low cost and not toxic thermoelectric devices based on abundant semiconductors.

  8. Nanostructured Si-alloys for silicon solar cells

    OpenAIRE

    Ding, Kaining

    2015-01-01

    In order to initiate further progress in silicon (Si) photovoltaics, a next-generation of Si solar cell concepts targeting both high performance and low-cost production needs to emerge. The objective of this thesis is to fabricate and characterize Si nanostructures embedded in a Si alloy matrix and implement these novel materials into Si based photovoltaic devices. In particular, silicon quantum dots (Si-QDs) in a silicon carbide (SiC)/Si-rich silicon oxide (SiOx) hetero-superlattice (HSL) st...

  9. Low temperature irradiation of FeB amorphous alloys

    International Nuclear Information System (INIS)

    These experiments show that low temperature electron irradiation induce localized defects in the short range order of the amorphous structure. These defects are assumed to be of Frenkel pair type. At low temperature, 2.5 MeV electron irradiation induces an higher concentration of defects in the amorphous than in its crystallized counterpart

  10. Electrical and optical properties of thin film of amorphous silicon nanoparticles

    International Nuclear Information System (INIS)

    Electrical and optical properties of thin film of amorphous silicon nanoparticles (a-Si) are studied. Thin film of silicon is synthesized on glass substrate under an ambient gas (Ar) atmosphere using physical vapour condensation system. We have employed Field Emission Scanning Electron Microscopy (FESEM), Transmission Electron Microscopy (TEM) and Atomic Force Microscopy (AFM) to study the morphology and microstructure of this film. It is observed that this silicon film contains almost spherical nanoparticles with size varying between 10 and 40 nm. The average surface roughness is about 140 nm as evident from the AFM image. X-ray diffraction analysis is also performed. The XRD spectrum does not show any significant peak which indicates the amorphous nature of the film. To understand the electrical transport phenomena, the temperature dependence of dc conductivity for this film is studied over a temperature range of (300-100 K). On the basis of temperature dependence of dc conductivity, it is suggested that the conduction takes place via variable range hopping (VRH). Three-dimensional Mott's variable range hopping (3D VRH) is applied to explain the conduction mechanism for the transport of charge carriers in this system. Various Mott's parameters such as density of states, degree of disorder, hopping distance, hopping energy are estimated. In optical properties, we have studied Fourier transform infra-red spectra and the photoluminescence of this amorphous silicon thin film. It is found that these amorphous silicon nanoparticles exhibits strong Si-O-Si stretching mode at 1060 cm-1, which suggests that the large amount of oxygen is adsorbed on the surface of these a-Si nanoparticles. The photoluminescence observed from these amorphous silicon nanoparticles has been explained with the help of oxygen related surface state mechanism.

  11. Synthesis of amorphous Ti-Al alloys by mechanical alloying of elemental powders

    Institute of Scientific and Technical Information of China (English)

    张俊红; 黄伯云; 贺跃辉; 周科朝; 刘咏

    2002-01-01

    Blended elemental powders with the nominal compositions (mole fraction, %) of Ti54Al46, Ti52Al48 and Ti50Al50 were mechanically alloyed in a planetary ball milling system for up to 100h.The structure evolution in these powders was characterized by scanning electron microscope, X-ray diffraction and differential thermal a nalysis techniques. It was found that elemental powders were progressively trans formed into nanocrystalline Ti(Al) supersaturated solid solution, then into amor phous phase. With increasing Al content, the formation of a fully Ti(Al) supersa turated solid solution and amorphous phase were accelerated, which are attributed to the fine grain size. And the grain size condition for formation of amorpho us phase in this system is ≤16 nm.

  12. Crystallization mechanism of silicon quantum dots upon thermal annealing of hydrogenated amorphous Si-rich silicon carbide films

    International Nuclear Information System (INIS)

    We have investigated the crystallization process of silicon quantum dots (QDs) imbedded in hydrogenated amorphous Si-rich silicon carbide (a-SiC:H) films. Analysis reveals that crystallization of silicon QDs upon thermal annealing of the samples can be explained in terms of bonding configuration and evolution of microstructure. The precursor gases were dissociated via electron impact reactions in the plasma-enhanced chemical vapor deposition, where the hydrogenated silicon radicals and reactive SiHn species lead to the formation of primary Si nuclei. With increasing annealing temperature, the breaking of SiHn bonds and decomposition of Si-rich SiC were progressively enhanced, allowing the formation of crystalline silicon QDs inside the a-SiC:H matrix. The results help clarify a probable mechanism for the growth of silicon QDs and provide the possibility to optimize the microstructure of silicon QDs in a-SiC:H films. - Highlights: • Si-rich SiC samples are grown by plasma-enhanced chemical vapor deposition. • Silicon radicals and reactive SiHn (n = 1,2,3) exist in the as-grown samples. • Annealing temperature induces the growth of crystalline silicon quantum dots. • Carbon atoms are incorporated in the formation of Si-C and C-H bonds in the matrix

  13. Direct Simulation of Ion Beam Induced Stressing and Amorphization of Silicon

    International Nuclear Information System (INIS)

    Using molecular dynamics (MD) simulation, the authors investigate the mechanical response of silicon to high dose ion-irradiation. The authors employ a realistic model to directly simulate ion beam induced amorphization. Structural properties of the amorphized sample are compared with experimental data and results of other simulation studies. The authors find the behavior of the irradiated material is related to the rate at which it can relax. Depending upon the ability to deform, the authors observe either the generation of a high compressive stress and subsequent expansion of the material, or generation of tensile stress and densification. The authors note that statistical material properties, such as radial distribution functions are not sufficient to differentiate between the different densities of the amorphous samples. For any reasonable deformation rate, the authors observe an expansion of the target upon amorphization in agreement with experimental observations. This is in contrast to simulations of quenching which usually result in a denser structure relative to crystalline Si. The authors conclude that although there is substantial agreement between experimental measurements and simulation results, the amorphous structures being investigated may have fundamental differences; the difference in density can be attributed to local defects within the amorphous network. Finally the authors show that annealing simulations of their amorphized samples can lead to a reduction of high energy local defects without a large scale rearrangement of the amorphous network. This supports the proposal that defects in a-Si are analogous to those in c-Si

  14. Direct Simulation of Ion Beam Induced Stressing and Amorphization of Silicon

    Energy Technology Data Exchange (ETDEWEB)

    Beardmore, K.M.; Gronbech-Jensen, N.

    1999-05-02

    Using molecular dynamics (MD) simulation, the authors investigate the mechanical response of silicon to high dose ion-irradiation. The authors employ a realistic model to directly simulate ion beam induced amorphization. Structural properties of the amorphized sample are compared with experimental data and results of other simulation studies. The authors find the behavior of the irradiated material is related to the rate at which it can relax. Depending upon the ability to deform, the authors observe either the generation of a high compressive stress and subsequent expansion of the material, or generation of tensile stress and densification. The authors note that statistical material properties, such as radial distribution functions are not sufficient to differentiate between the different densities of the amorphous samples. For any reasonable deformation rate, the authors observe an expansion of the target upon amorphization in agreement with experimental observations. This is in contrast to simulations of quenching which usually result in a denser structure relative to crystalline Si. The authors conclude that although there is substantial agreement between experimental measurements and simulation results, the amorphous structures being investigated may have fundamental differences; the difference in density can be attributed to local defects within the amorphous network. Finally the authors show that annealing simulations of their amorphized samples can lead to a reduction of high energy local defects without a large scale rearrangement of the amorphous network. This supports the proposal that defects in a-Si are analogous to those in c-Si.

  15. Investigations of the atomic structure of amorphous ytterbium-alloys by Moessbauer spectroscopy

    International Nuclear Information System (INIS)

    Atomic-scale structures of the amorphous alloys Yb80X20 (X = Cu, Ag, Au, Pd, Bi) have been investigated with a 174Yb-Moessbauer source. The distribution of the quadrupole splitting parameters obtained from the analysis of the Moessbauer spectra was compared with the theoretical function for a charge distribution corresponding to dense random packing (DRP) of ions. The atomic structure deduced from the distribution of splitting parameters was consistent with the DRP-model in the amorphous alloys Yb80Cu20, Yb80Ag20, Yb80Au20, Yb80Pd20. In contrast the Moessbauer spectrum of the amorphous alloy Yb80Bi20 showed clear evidence of short range order. This is presumably due to the tendency of bismuth to form covalent bondings. (orig./GSCH)

  16. Preparation and Properties of Mg-Cu-Y-Al bulk Amorphous Alloys

    DEFF Research Database (Denmark)

    Pryds, Nini; Eldrup, Morten Mostgaard; Ohnuma, M.; Pedersen, Allan Schrøder; Hattel, J.; Linderoth, Søren

    2000-01-01

    Bulk amorphous (Mg(1-gamma)Al(gamma))(60)CU(30)Y(10) alloys were prepared using a relatively simple technique of rapid cooling of the melt in a copper wedge mould. The temperature vs, time was recorded during the cooling and solidification process of the melt and compared with a spacial and......-ray diffraction (XRD) and differential scanning calorimetry (DSC) for different alloy compositions and annealing temperatures. On annealing into the supercooled liquid state (441 K), specimens with no Al content remain basically amorphous while nanoparticles are formed and remain stable also at higher...... temperatures in specimens containing a few percent Al. The alloy with no Al crystallises apparently without the formation of nanoparticles. The critical cooling rate for the formation of an amorphous Mg(60)CU(30)Y(10) specimen was determined experimentally by a combination of DSC data and temperature vs, time...

  17. Crystallization kinetics of amorphous Zr65Cu25Al10 alloy

    Institute of Scientific and Technical Information of China (English)

    王焕荣; 石志强; 王艳; 滕新营; 叶以富; 闵光辉; 张均艳

    2002-01-01

    Crystallization behavior of amorphous Zr65Cu25Al10 alloy under isothermal annealing condition was investigated by DSC and XRD. It is found that two exothermic peaks appear in the DSC curve of amorphous Zr65Cu25Al10 alloy, indicating that the crystallization proceeds through double-stage mode. The crystallization process of amorphous Zr65Cu25Al10 alloy under isothermal annealing condition is mainly controlled by nucleation and one-dimensional growth with the crystallized volume fraction smaller than 70%. With the crystallized volume fraction ranging from 70% to 90%, crystallization process is mainly dominated by the growth of three-dimensional pre-existing quench-in nuclei. And when the crystallized volume fraction reaches above 90%, transient nucleation becomes the master of the crystallization process.

  18. Phase separation and crystallization process of amorphous Fe78B12Si9Ni1 alloy

    International Nuclear Information System (INIS)

    The influence of the melt heat treatment on the structure and crystallization process of the rapidly quenched amorphous Fe78B12Si9Ni1 alloys have been investigated by means of x-ray diffraction, DSC and TEM. Amorphous phase separation has been observed in the alloys quenched after the preliminary high temperature heat treatment of the liquid alloy (heating above 1400°C). Comparative analysis of the pair distribution functions demonstrates that this phase separation accompanied by a changes in the local atomic arrangement. It has been found that crystallization process at heating is strongly dependent on the initial amorphous phase structure - homogeneous or phase separated. In the last case crystallization goes through the formation of a new metastable hexagonal phase [a=12.2849(9) Ǻ, c=7.6657(8) Ǻ]. At the same time the activation energy for crystallization (Ea) reduces from 555 to 475 kJ mole−1

  19. Charging/discharging behavior and mechanism of silicon quantum dots embedded in amorphous silicon carbide films

    International Nuclear Information System (INIS)

    The charging/discharging behavior of Si quantum dots (QDs) embedded in amorphous silicon carbide (a-SiCx) was investigated based on the Al/insulating layer/Si QDs embedded in a-SiCx/SiO2/p-Si (metal-insulator-quantum dots-oxide-silicon) multilayer structure by capacitance-voltage (C-V) and conductance-voltage (G-V) measurements. Transmission electron microscopy and Raman scattering spectroscopy measurements reveal the microstructure and distribution of Si QDs. The occurrence and shift of conductance peaks indicate the carrier transfer and the charging/discharging behavior of Si QDs. The multilayer structure shows a large memory window of 5.2 eV at ±8 V sweeping voltage. Analysis of the C-V and G-V results allows a quantification of the Coulomb charging energy and the trapped charge density associated with the charging/discharging behavior. It is found that the memory window is related to the size effect, and Si QDs with large size or low Coulomb charging energy can trap two or more electrons by changing the charging voltage. Meanwhile, the estimated lower potential barrier height between Si QD and a-SiCx, and the lower Coulomb charging energy of Si QDs could enhance the charging and discharging effect of Si QDs and lead to an enlarged memory window. Further studies of the charging/discharging mechanism of Si QDs embedded in a-SiCx can promote the application of Si QDs in low-power consumption semiconductor memory devices

  20. Etching characteristics of hydrogenated amorphous silicon and poly crystalline silicon by hydrogen hyperthermal neutral beam

    International Nuclear Information System (INIS)

    A hydrogen hyperthermal neutral beam (HNB) generated by an inclined slot-excited antenna electron cyclotron resonance plasma source has been used to etch hydrogenated amorphous silicon (a-Si:H) and polycrystalline silicon (poly-Si) films. In this work, we present selective etching of a-Si:H with respect to poly-Si by hydrogen plasma and hydrogen HNB under various substrate temperatures, gas pressures, and bias voltages of the neutralizer. We have observed that the etch rate of a-Si:H is considerably higher than that of poly-Si. The etch rate is largely dependent upon the substrate temperature. In this experiment, the optimal substrate temperature for improving the etch rate is approximately at 150 °C. The root mean square surface roughness of the etched material reaches a maximum at 150 °C and decreases rapidly. The etch rate of poly-Si is not sensitive to changes in the experimental condition, such as the substrate temperatures and gas pressures. However, as the hydrogen HNB energy is increased, the etch rate of poly-Si also increases gradually. The hydrogen HNB energy contributes in improving the etch rate of a-Si:H and poly-Si films. - Highlights: • The highest etch rate is shown to be at the substrate temperature of 150 °C. • We investigated the effects of hydrogen hyperthermal neutral beam (HNB) energy. • Increasing HNB energy shows an increase in the etch rate of the poly-Si and a-Si:H

  1. Etching characteristics of hydrogenated amorphous silicon and poly crystalline silicon by hydrogen hyperthermal neutral beam

    Energy Technology Data Exchange (ETDEWEB)

    Hong, Seung Pyo; Kim, Jongsik; Park, Jong-Bae; Oh, Kyoung Suk; Kim, Young-Woo; Yoo, Suk Jae; Kim, Dae Chul, E-mail: dchcharm@nfri.re.kr

    2015-03-31

    A hydrogen hyperthermal neutral beam (HNB) generated by an inclined slot-excited antenna electron cyclotron resonance plasma source has been used to etch hydrogenated amorphous silicon (a-Si:H) and polycrystalline silicon (poly-Si) films. In this work, we present selective etching of a-Si:H with respect to poly-Si by hydrogen plasma and hydrogen HNB under various substrate temperatures, gas pressures, and bias voltages of the neutralizer. We have observed that the etch rate of a-Si:H is considerably higher than that of poly-Si. The etch rate is largely dependent upon the substrate temperature. In this experiment, the optimal substrate temperature for improving the etch rate is approximately at 150 °C. The root mean square surface roughness of the etched material reaches a maximum at 150 °C and decreases rapidly. The etch rate of poly-Si is not sensitive to changes in the experimental condition, such as the substrate temperatures and gas pressures. However, as the hydrogen HNB energy is increased, the etch rate of poly-Si also increases gradually. The hydrogen HNB energy contributes in improving the etch rate of a-Si:H and poly-Si films. - Highlights: • The highest etch rate is shown to be at the substrate temperature of 150 °C. • We investigated the effects of hydrogen hyperthermal neutral beam (HNB) energy. • Increasing HNB energy shows an increase in the etch rate of the poly-Si and a-Si:H.

  2. Charging/discharging behavior and mechanism of silicon quantum dots embedded in amorphous silicon carbide films

    Energy Technology Data Exchange (ETDEWEB)

    Wen, Xixing; Zeng, Xiangbin, E-mail: eexbzeng@163.com; Zheng, Wenjun; Liao, Wugang [School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Feng, Feng [School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074 (China); Shenzhen Institute of Huazhong University of Science and Technology, Shenzhen 518000 (China)

    2015-01-14

    The charging/discharging behavior of Si quantum dots (QDs) embedded in amorphous silicon carbide (a-SiC{sub x}) was investigated based on the Al/insulating layer/Si QDs embedded in a-SiC{sub x}/SiO{sub 2}/p-Si (metal-insulator-quantum dots-oxide-silicon) multilayer structure by capacitance-voltage (C-V) and conductance-voltage (G-V) measurements. Transmission electron microscopy and Raman scattering spectroscopy measurements reveal the microstructure and distribution of Si QDs. The occurrence and shift of conductance peaks indicate the carrier transfer and the charging/discharging behavior of Si QDs. The multilayer structure shows a large memory window of 5.2 eV at ±8 V sweeping voltage. Analysis of the C-V and G-V results allows a quantification of the Coulomb charging energy and the trapped charge density associated with the charging/discharging behavior. It is found that the memory window is related to the size effect, and Si QDs with large size or low Coulomb charging energy can trap two or more electrons by changing the charging voltage. Meanwhile, the estimated lower potential barrier height between Si QD and a-SiC{sub x}, and the lower Coulomb charging energy of Si QDs could enhance the charging and discharging effect of Si QDs and lead to an enlarged memory window. Further studies of the charging/discharging mechanism of Si QDs embedded in a-SiC{sub x} can promote the application of Si QDs in low-power consumption semiconductor memory devices.

  3. Charging/discharging behavior and mechanism of silicon quantum dots embedded in amorphous silicon carbide films

    Science.gov (United States)

    Wen, Xixing; Zeng, Xiangbin; Zheng, Wenjun; Liao, Wugang; Feng, Feng

    2015-01-01

    The charging/discharging behavior of Si quantum dots (QDs) embedded in amorphous silicon carbide (a-SiCx) was investigated based on the Al/insulating layer/Si QDs embedded in a-SiCx/SiO2/p-Si (metal-insulator-quantum dots-oxide-silicon) multilayer structure by capacitance-voltage (C-V) and conductance-voltage (G-V) measurements. Transmission electron microscopy and Raman scattering spectroscopy measurements reveal the microstructure and distribution of Si QDs. The occurrence and shift of conductance peaks indicate the carrier transfer and the charging/discharging behavior of Si QDs. The multilayer structure shows a large memory window of 5.2 eV at ±8 V sweeping voltage. Analysis of the C-V and G-V results allows a quantification of the Coulomb charging energy and the trapped charge density associated with the charging/discharging behavior. It is found that the memory window is related to the size effect, and Si QDs with large size or low Coulomb charging energy can trap two or more electrons by changing the charging voltage. Meanwhile, the estimated lower potential barrier height between Si QD and a-SiCx, and the lower Coulomb charging energy of Si QDs could enhance the charging and discharging effect of Si QDs and lead to an enlarged memory window. Further studies of the charging/discharging mechanism of Si QDs embedded in a-SiCx can promote the application of Si QDs in low-power consumption semiconductor memory devices.

  4. Relaxation process of Fe(CuNb)SiB amorphous alloys investigated by dynamical calorimetry

    International Nuclear Information System (INIS)

    Differential scanning calorimetry and dynamic differential scanning calorimetry were used to analyze the relaxation process of Fe(CuNb)SiB amorphous alloys. The Curie temperature (TC) evolution of the amorphous phase during relaxation as a function of heating rate, time and pre-annealing temperature were measured. Two distinct relaxation processes are observed, consequent with topological and chemical short range order changes. copyright 1997 American Institute of Physics

  5. Relaxation process of Fe(CuNb)SiB amorphous alloys investigated by dynamical calorimetry

    OpenAIRE

    Zhu, J.; Clavaguera-Mora, M. T.; Clavaguera, N.

    1997-01-01

    Differential scanning calorimetry and dynamic differential scanning calorimetry were used to analyze the relaxation process of Fe(CuNb)SiB amorphous alloys. The Curie temperature(TC) evolution of the amorphous phase during relaxation as a function of heating rate, time and pre-annealing temperature were measured. Two distinct relaxation processes are observed, consequent with topological and chemical short range order changes.

  6. Amorphous Silicon Position Detectors for the Link Alignment System of the CMS Detector: Users Handbook

    Energy Technology Data Exchange (ETDEWEB)

    Calderon, A.; Gomez, G.; Gonzalez-Sanchez, F. J.; Martinez-Rivero, C.; Matorras, F.; Rodrigo, T.; Ruiz-Arbol, P.; Scodellaro, L.; Vila, I.; Virto, A. L.; Alberdi, J.; Arce, P.; Barcala, J.M.; Calvo, E.; Ferrando, A.; Josa, M. I.; Molinero, A.; Navarrete, J.; Oller, J. C.; Yuste, C.

    2007-07-01

    We present the general characteristics, calibration procedures and measured performance of the Amorphous Silicon Position Detectors installed in the Link Alignment System of the CMS Detector for laser beam detection and reconstruction and give the Data Base to be used as a Handbook during CMS operation. (Author) 10 refs.

  7. Preliminary radiation tests of 32 μm thick hydrogenated amorphous silicon films

    International Nuclear Information System (INIS)

    Preliminary radiation tests of hydrogenated amorphous silicon n-i-p photodiodes deposited on a coated glass substrate are presented in this paper. These tests have been performed using a 24 GeV proton beam. We report results on the fluence dependence of the diode dark current and of the signal induced by a proton spill

  8. Preliminary radiation tests of 32 {mu}m thick hydrogenated amorphous silicon films

    Energy Technology Data Exchange (ETDEWEB)

    Despeisse, M. [CERN, 1211 Geneva 23 (Switzerland)]. E-mail: matthieu.despeisse@cern.ch; Jarron, P. [CERN, 1211 Geneva 23 (Switzerland); Johansen, K.M. [CERN, 1211 Geneva 23 (Switzerland); Moraes, D. [CERN, 1211 Geneva 23 (Switzerland); Shah, A. [IMT, rue A.L Breguet 2, CH-2000 Neuchatel (Switzerland); Wyrsch, N. [IMT, rue A.L Breguet 2, CH-2000 Neuchatel (Switzerland)

    2005-10-21

    Preliminary radiation tests of hydrogenated amorphous silicon n-i-p photodiodes deposited on a coated glass substrate are presented in this paper. These tests have been performed using a 24 GeV proton beam. We report results on the fluence dependence of the diode dark current and of the signal induced by a proton spill.

  9. Thermal ideality factor of hydrogenated amorphous silicon p-i-n solar cells

    NARCIS (Netherlands)

    Kind, R.; Van Swaaij, R.A.C.M.M.; Rubinelli, F.A.; Solntsev, S.; Zeman, M.

    2011-01-01

    The performance of hydrogenated amorphous silicon (a-Si:H) p-i-n solar cells is limited, as they contain a relatively high concentration of defects. The dark current voltage (JV) characteristics at low forward voltages of these devices are dominated by recombination processes. The recombination rate

  10. Test Results of the Semi-transparent Amorphous Silicon Sensors for the Link System of CMS

    CERN Document Server

    Fernández, Marcos; Figueroa, Carlos; García, N; Josa-Mutuberria, I; Molinero, Antonio; Oller, Juan Carlos; Rodrigo, Teresa; Vila, Ivan

    1998-01-01

    Semitransparent amorphous silicon sensors have been proposed as the 2D positioning sensors for the link system of the CMS alignment. We have developed a general method to characterise these sensors from the signal reconstruction to the beam deflection. The transparency for the HeNe wavelength has also been calculated.

  11. Amorphous Silicon Position Detectors for the Link Alignment System of the CMS Detector: Users Handbook

    International Nuclear Information System (INIS)

    We present the general characteristics, calibration procedures and measured performance of the Amorphous Silicon Position Detectors installed in the Link Alignment System of the CMS Detector for laser beam detection and reconstruction and give the Data Base to be used as a Handbook during CMS operation. (Author) 10 refs

  12. A comparison of degradation in three amorphous silicon PV module technologies

    Energy Technology Data Exchange (ETDEWEB)

    Radue, C.; van Dyk, E.E. [Physics Department, PO Box 77000, Nelson Mandela Metropolitan University, Port Elizabeth 6031 (South Africa)

    2010-03-15

    Three commercial amorphous silicon modules manufactured by monolithic integration and consisting of three technology types were analysed in this study. These modules were deployed outdoors for 14 months and underwent degradation. All three modules experienced the typical light-induced degradation (LID) described by the Staebler-Wronski effect, and this was followed by further degradation. A 14 W single junction amorphous silicon module degraded by about 45% of the initial measured maximum power output (P{sub MAX}) at the end of the study. A maximum of 30% of this has been attributed to LID and the further 15% to cell mismatch and cell degradation. The other two modules, a 64 W triple junction amorphous silicon module, and a 68 W flexible triple junction amorphous silicon module, exhibited LID followed by seasonal variation in the degraded P{sub MAX}. The 64 W module showed a maximum degradation in P{sub MAX} of about 22%. This is approximately 4% more than the manufacturer allowed for the initial LID. However, the seasonal variation in P{sub MAX} seems to be centred around the manufacturer's rating ({+-}4%). The 68 W flexible module has shown a maximum decrease in P{sub MAX} of about 27%. This decrease is about 17% greater than the manufacturer allowed for the initial LID. (author)

  13. Nonlinear properties of and nonlinear processing in hydrogenated amorphous silicon waveguides

    DEFF Research Database (Denmark)

    Kuyken, B.; Ji, Hua; Clemmen, S.;

    2011-01-01

    We propose hydrogenated amorphous silicon nanowires as a platform for nonlinear optics in the telecommunication wavelength range. Extraction of the nonlinear parameter of these photonic nanowires reveals a figure of merit larger than 2. It is observed that the nonlinear optical properties of these...

  14. Amorphous silicon research. Annual subcontract report, October 1, 1994--September 30, 1995

    Energy Technology Data Exchange (ETDEWEB)

    Arya, R R; Bennett, M; Bradley, D [and others

    1996-02-01

    The major effort in this program is to develop cost-effective processes which satisfy efficiency, yield, and material usage criteria for mass production of amorphous silicon-based multijunction modules. New and improved processes were developed for the component cells and a more robust rear contact was developed for better long term stability.

  15. Preparation and Characterisation of Amorphous-silicon Photovoltaic Devices Having Microcrystalline Emitters

    International Nuclear Information System (INIS)

    The present work summarises the essential aspects of the research carried out so far at CIEMAT on amorphous-silicon solar cells. The experience accumulated on the preparation and characterisation of amorphous and microcrystalline silicon has allowed to start from intrinsic (absorbent) and p- and n-type (emitters) materials not only having excellent optoelectronic properties, but enjoying certain technological advantages with respect to those developed by other groups. Among these are absorbent-layer growth rates between 5 and 10 times as fast as conventional ones and microcrystalline emitters prepared without using hydrogen. The preparation of amorphous-silicon cells has required the solution of a number of problems, such as those related to pinholes, edge leak currents and diffusion of metals into the semiconductor. Once such constraints have been overcome, it has been demonstrated not only that the amorphous-silicon technology developed at CIEMAT is valid for making solar cells, but also that the quality of the semiconductor material is good for the application according to the partial results obtained. The development of thin-film laser-scribing technology is considered essential. Additionally it has been concluded that cross contamination, originated by the fact of using a single-chamber reactor, is the basic factor limiting the quality of the cells developed at CIEMAT. The present research activity is highly focused on the solution of this problem. (Author)23 refs

  16. Size effects on the thermal conductivity of amorphous silicon thin films

    Science.gov (United States)

    Braun, Jeffrey L.; Baker, Christopher H.; Giri, Ashutosh; Elahi, Mirza; Artyushkova, Kateryna; Beechem, Thomas E.; Norris, Pamela M.; Leseman, Zayd C.; Gaskins, John T.; Hopkins, Patrick E.

    2016-04-01

    We investigate thickness-limited size effects on the thermal conductivity of amorphous silicon thin films ranging from 3 to 1636 nm grown via sputter deposition. While exhibiting a constant value up to ˜100 nm, the thermal conductivity increases with film thickness thereafter. The thickness dependence we demonstrate is ascribed to boundary scattering of long wavelength vibrations and an interplay between the energy transfer associated with propagating modes (propagons) and nonpropagating modes (diffusons). A crossover from propagon to diffuson modes is deduced to occur at a frequency of ˜1.8 THz via simple analytical arguments. These results provide empirical evidence of size effects on the thermal conductivity of amorphous silicon and systematic experimental insight into the nature of vibrational thermal transport in amorphous solids.

  17. A preliminary investigation into hybrid photovoltaic cells with organic phthalocyanines and amorphous silicon heterojunction

    International Nuclear Information System (INIS)

    Hybrid photovoltaic cells take the advantages of silicon in charge carrier separation and transport and organic dyes in strong complementary light absorption. Photovoltaic responses from a set of hybrid solar cells based on amorphous silicon and phthalocyanine dyes of double- or triple-layer heterojunction structures were investigated, which were found to have thickness dependence with the organic active layers. It was found that the photocurrent contributions from organic layers are limited, although they are strong light absorbers. The main photocurrent contributions are from the silicon counterpart. (paper)

  18. Magnetic circular X-ray dichroism in amorphous Fe-RE alloys

    International Nuclear Information System (INIS)

    Magnetic circular X-ray dichroism and X-ray absorption near-edge structures were measured at the rare-earth (RE) L3,2 edges in amorphous Fe-RE alloys (RE=Pr, Sm, Gd, Tb and Dy). The Gd 5d spin and orbital moments in the amorphous 80 at% Fe-Gd alloy are evaluated to be about 0.39μB and -0.02μB per atom at room temperature using the sum rules. ((orig.))

  19. Compression behavior and equation of state of Ni77P23 amorphous alloy

    Institute of Scientific and Technical Information of China (English)

    LI Gong; GAO YunPeng; SUN YiNan; MA MingZhen; LIU Jing; LIU RiPing

    2007-01-01

    The compression behavior of Ni77P23 amorphous alloy is investigated at room temperature in a diamond-anvil cell instrument using in-situ high pressure energy dispersive X-ray diffraction with a synchrotron radiation source. The equation of state is determined by fitting the experimental data according to Birch-Murnaghan equation: -△V/V0=0.08606P-3.2×10-4P2+5.7×10-6P3. It is found that the structure of Ni77P23 amorphous alloy is stable under pressures up to 30.5 Gpa.

  20. Compression Behaviour of Ni77P23 Amorphous Alloy up to 30.5 GPa

    Institute of Scientific and Technical Information of China (English)

    LI Gong; ZHANG Xin-Yu; SUN Yi-Nan; QIAN Yu-Qing; LIU Jing; LIU Ri-Ping

    2005-01-01

    @@ The compression behaviour of Ni77P23 amorphous alloy is investigated at room temperature in a diamond-anvil cell instrument using in-situ high pressure energy dispersive x-ray diffraction with a synchrotron radiation source.The equation of state is determined by fitting the experimental data according to the Birch-Murnaghan equation.It is found that the structure of Ni77P23 amorphous alloy is stable under pressures up to 30.5GPa. Within the pressure range from zero to the experimental one, the pressure-induced structural relaxation is reversible.

  1. Effect of Cerium on Chemical Short-Range Order of Al-Fe-Ce Amorphous Alloy

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    The chemical short-range order of Al-Fe-Ce amorphous alloy was studied by means of X-ray diffraction(XRD) and differential scanning calorimetry(DSC). It is found that the prepeak position in X-ray diffraction intensity curve shifts to higher angles as the content of Fe increases, but it shifts to smaller angles as the content of Ce increases. The crystallization character of the amorphous alloy changes with the variation of the content of Fe and Ce. Ce can improve the interaction between atoms and the capacity of compound formation, so it is favorable to Al-based glass formability.

  2. Magnetic, magnetocaloric properties and phenomenological model in amorphous Fe60Ru20B20 alloy

    Science.gov (United States)

    Boutahar, A.; Lassri, H.; Hlil, E. K.

    2015-11-01

    Magnetic, magnetocaloric properties and phenomenological model of amorphous Fe60Ru20B20 alloy are investigated in detail. The amorphous alloy has been synthesized using melt spinning method. The magnetic transition nature undergoes a second-order magnetic phase transition from ferromagnetic to paramagnetic states with a Curie temperature of 254 K. Basis on the thermodynamic Maxwell's relation, magnetic entropy change (-ΔSM) is calculated. Further, we also report a theoretical investigation of the magnetocaloric effect using a phenomenological model. The best model parameters and their variation with temperature and the magnetic field were determined. The theoretical predictions are found to agree closely with experimental measurements.

  3. Predictive study of electronic properties of silicon-carbon alloys

    International Nuclear Information System (INIS)

    We analyzed the atomic and electronic structures in relaxed Si1-yC y crystals using the local density approximation (LDA) as implemented within the full-potential linearized augmented plane wave (FP-LAPW) basis. The band gaps are compared with those calculated with nonlocal corrections for the exchange-correlation energy functional and those calculated by using a GW approach. For small concentrations of carbon, it is found that carbon-silicon alloys are semiconducting with a very small band gap. These results are consistent with earlier LDA calculations, which predicted that the band gap of carbon-silicon alloy at low carbon concentrations is smaller than that of pure silicon. The optical band gap bowing is found to be strongly composition dependent. Furthermore, we found that the SiC alloys are characterized by a strong competition between structural (volume deformation) and chemical (charge transfer) effects leading to a giant optical gap bowing

  4. Defects study of hydrogenated amorphous silicon samples and their relation with the substrate and deposition conditions

    International Nuclear Information System (INIS)

    The goal of this work is to study the properties of the defects aiming to explore the types of defects and the effect of various deposition parameters such as substrate temperature, the kind of the substrate, gas pressure and deposition rate. Two kinds of samples have been used; The first one was a series of Schottky diodes, and the second one a series of solar cells (p-i-n junction) deposited on crystalline silicon or on corning glass substrates with different deposition parameters. The deposition parameters were chosen to obtain materials whose their structures varying from amorphous to microcrystalline silicon including polymorphous silicon. Our results show that the polymorphous silicon samples deposited at high deposition rates present the best photovoltaic properties in comparison with those deposited at low rates. Also we found that the defects concentration in high deposition rate samples is less at least by two orders than that obtained in low deposition rate polymorphous, microcrystalline and amorphous samples. This study shows also that there is no effect of the substrate, or the thin films of highly doped amorphous silicon deposited on the substrate, on the creation and properties of these defects. Finally, different experimental methods have been used; a comparison between their results has been presented. (author)

  5. Amorphous Silicon Carbide Passivating Layers to Enable Higher Processing Temperature in Crystalline Silicon Heterojunction Solar Cells

    Energy Technology Data Exchange (ETDEWEB)

    Boccard, Mathieu [Arizona State Univ., Mesa, AZ (United States); Holman, Zachary [Arizona State Univ., Mesa, AZ (United States)

    2015-04-06

    "Very efficient crystalline silicon (c-Si) solar cells have been demonstrated when thin layers of intrinsic and doped hydrogenated amorphous silicon (a-Si:H) are used for passivation and carrier selectivity in a heterojunction device. One limitation of this device structure is the (parasitic) absorption in the front passivation/collection a-Si:H layers; another is the degradation of the a-Si:H-based passivation upon temperature, limiting the post-processes to approximately 200°C thus restricting the contacting possibilities and potential tandem device fabrication. To alleviate these two limitations, we explore the potential of amorphous silicon carbide (a-SiC:H), a widely studied material in use in standard a-Si:H thin-film solar cells, which is known for its wider bandgap, increased hydrogen content and stronger hydrogen bonding compared to a-Si:H. We study the surface passivation of solar-grade textured n-type c-Si wafers for symmetrical stacks of 10-nm-thick intrinsic a-SiC:H with various carbon content followed by either p-doped or n-doped a-Si:H (referred to as i/p or i/n stacks). For both doping types, passivation (assessed through carrier lifetime measurements) is degraded by increasing the carbon content in the intrinsic a-SiC:H layer. Yet, this hierarchy is reversed after annealing at 350°C or more due to drastic passivation improvements upon annealing when an a-SiC:H layer is used. After annealing at 350°C, lifetimes of 0.4 ms and 2.0 ms are reported for i/p and i/n stacks, respectively, when using an intrinsic a-SiC:H layer with approximately 10% of carbon (initial lifetimes of 0.3 ms and 0.1 ms, respectively, corresponding to a 30% and 20-fold increase, respectively). For stacks of pure a-Si:H material the lifetimes degrade from 1.2 ms and 2.0 ms for i/p and i/n stacks, respectively, to less than 0.1 ms and 1.1 ms (12-fold and 2-fold decrease, respectively). For complete solar cells using pure a-Si:H i/p and i/n stacks, the open-circuit voltage (Voc

  6. Direct observations of thermally induced structural changes in amorphous silicon carbide

    International Nuclear Information System (INIS)

    Thermally induced structural relaxation in amorphous silicon carbide (SiC) has been examined by means of in situ transmission electron microscopy (TEM). The amorphous SiC was prepared by high-energy ion beam irradiation into a single crystalline 4H-SiC substrate. Cross-sectional TEM observations and electron energy-loss spectroscopy measurements revealed that thermal annealing induces a remarkable volume reduction, so-called densification, of amorphous SiC. From radial distribution function analyses using electron diffraction, notable changes associated with structural relaxation were observed in chemical short-range order. It was confirmed that the structural changes observed by the in situ TEM study agree qualitatively with those of the bulk material. On the basis of the alteration of chemical short-range order, we discuss the origin of thermally induced densification in amorphous SiC

  7. Low-temperature crystallization of amorphous silicon and amorphous germanium by soft X-ray irradiation

    International Nuclear Information System (INIS)

    The low-temperature-crystallization effects of soft X-ray irradiation on the structural properties of amorphous Si and amorphous Ge films were investigated. From the differences in crystallization between Si and Ge, it was found that the effects of soft X-ray irradiation on the crystallization strongly depended on the energy band gap and energy level. The crystallization temperatures of the amorphous Si and amorphous Ge films decreased from 953 K to 853 K and 773 K to 663 K, respectively. The decrease in crystallization temperature was also related to atoms transitioning into a quasi-nucleic phase in the films. The ratio of electron excitation and migration effects to thermal effects was controlled using the storage-ring current (photon flux density). Therefore, we believe that low-temperature crystallization can be realized by controlling atomic migration through electron excitation. - Highlights: • This work investigates the crystallization mechanism for soft X-ray irradiation. • The soft X-ray crystallization depended on the energy band gap and energy level. • The decrease in the crystallization temperature for Si and Ge films was 100 K. • This decrement was related to atoms transitioning into a quasi-nucleic phase

  8. Molecular dynamics studies of the bonding properties of amorphous silicon nitride coatings on crystalline silicon

    OpenAIRE

    Butler, K.T.; Lamers, M.P.W.E.; Weeber, A. W.; Harding, J. H.

    2011-01-01

    In this paper we present molecular dynamics simulations of silicon nitride, both in bulk and as an interface to crystalline silicon. We investigate, in particular, the bonding structure of the silicon nitride and analyze the simulations to search for de- fective geometries which have been identified as potential charge carrier traps when silicon nitride forms an interface with silicon semiconductors. The simulations reveal how the bonding patterns in silicon nitride are dependent upon the sto...

  9. Amorphous silicon carbide heterojunction solar cells on p-type substrates

    International Nuclear Information System (INIS)

    The performance of silicon heterojunction (SHJ) solar cells is discussed in this paper in regard to their dependence on the applied amorphous silicon layers, their thicknesses and surface morphology. The emitter system investigated in this work consists of an n-doped, hydrogenized, amorphous silicon carbide a-SiC:H(n) layer with or without a pure, hydrogenized, intrinsic, amorphous silicon a-Si:H(i) intermediate layer. All solar cells were fabricated on p-type FZ-silicon and feature a high-efficiency backside consisting of a SiO2 passivation layer and a diffused local boron back surface field, allowing us to focus only on the effects of the front side emitter system. The highest solar cell efficiency achieved within this work is 18.5%, which is one of the highest values for SHJ-solar cells using p-type substrates. A dependence of the passivation quality on the surface morphology was only observed for solar cells including an a-Si:H(i) layer. It could be shown that the fill factor suffers from a reduction due to a reduced pseudo fill factor for emitter thicknesses below 11 nm due to a lower passivation quality and/or a higher potential for shunting thorough the a-Si emitter to the crystalline wafer with the conductive indium tin oxide layer. Furthermore, the influence of a variation of the doping gas flow (PH3) during the plasma enhanced chemical vapor deposition of the doped amorphous silicon carbide a-SiC:H(n) on the solar cell current-voltage characteristic-parameter has been investigated. We could demonstrate that a-SiC:H(n) shows in principle the same dependence on PH3-flow as pure a-Si:H(n).

  10. Magnetic and mechanical properties in FeXSiB (X = Cu, Zr, Co) amorphous alloys

    OpenAIRE

    P. Kwapuliński; Rasek, J.; Z. Stokłosa; G. Badura; B. Kostrubiec; Haneczok, G.

    2008-01-01

    Purpose: The idea of the paper is to study the influence of different alloying additions (Cu, Zr, Nb) on structuralrelaxation, crystallization, and improvement of soft magnetic properties in amorphous alloys of the type FeXSiBobtained by melt spinning technique.Design/methodology/approach: Magnetic and electric characteristics of the as quenched and successivelyannealed samples were determined at room temperature. Experiments were carried out by applying magneticpermeability measurements (Max...

  11. Atomic short-range order in Fe-C amorphous metal alloys

    International Nuclear Information System (INIS)

    Within frameworks of computer experiment by the method of molecular dynamics the processes of structural organization of Fe-C system amorphous alloys are investigated. It is shown that the influence of carbon concentration on the relationship between main constituents of local composition order: atomic configurations with a central position of carbon atoms and iron atoms positioned in apices of the configurations of octahedral and trigonal-prismatic coordination is opposite to that observed in crystalline alloys of the system

  12. Dangling bond electron spin-lattice relaxation in rf-sputtered hydrogenated amorphous silicon and silicon carbide

    International Nuclear Information System (INIS)

    Electron spin resonance methods have been used to measure the temperature dependence of the spin-lattice relaxation time T1 of dangling bond electrons in hydrogenated amorphous silicon and silicon carbide samples prepared by radio frequency sputtering. The T1 measurements were made by a combination of continuous-wave absorption mode saturation and periodic adiabatic passage methods over the temperature range 100--400 K, yielding T/sup -1/1proportionalT2 behavior consistent with relaxation by two-level systems

  13. Amorphous silicon materials and solar cells - Progress and directions

    Science.gov (United States)

    Sabisky, E.; Mahan, H.; McMahon, T.

    In 1978, the U.S. Department of Energy initiated government sponsored research in amorphous materials and thin film solar cells. The program was subsequently transferred to the Solar Energy Research Institute for program management. The program grew into a major program for the development of high efficiency (greater than 10 percent), cost effective (15-40 cents per peak watt) thin film amorphous solar cells. The present international interest, the substantial progress made in the device area (2 percent PIN cell in 1976 to 10 percent PIN cell in 1982), and the marketing of the first consumer products using thin film solar cells are to a large ducts using thin film solar cells are to a large extent a consequence of this goal-oriented program.

  14. Nanoparticles embedded in hydrogenated amorphous silicon thin layers

    Czech Academy of Sciences Publication Activity Database

    Remeš, Zdeněk; Stuchlík, Jiří; Stuchlíková, The-Ha; Purkrt, Adam; Fajgar, Radek; Dřínek, Vladislav; Zhuravlev, K.; Galkin, N.G.

    Aachen : ICANS26, 2015 - (Carius, R.). s. 196-197 [International Conference on Amorphous and Nanocrystalline Semiconductors /26./ (ICANS26). 13.09.2015-18.09.2015, Aachen] R&D Projects: GA ČR(CZ) GA14-05053S; GA MŠk(CZ) LD14011; GA MŠk LH12236 Institutional support: RVO:68378271 ; RVO:67985858 Keywords : a-Si:H * LED * RLA * RDE Subject RIV: BM - Solid Matter Physics ; Magnetism

  15. An amorphous phase formation at palladium / silicon oxide (Pd/SiOx) interface through electron irradiation - electronic excitation process

    International Nuclear Information System (INIS)

    A Pd-Si amorphous phase was formed at a palladium/silicon oxide (Pd/SiOx) interface at room temperature by electron irradiation at acceleration voltages ranging between 25 kV and 200 kV. Solid-state amorphization was stimulated without the electron knock-on effects. The total dose required for the solid-state amorphization decreases with decreasing acceleration voltage. This is the first report on electron irradiation induced metallic amorphous formation caused by the electronic excitation at metal/silicon oxide interface

  16. An amorphous phase formation at palladium / silicon oxide (Pd/SiOx) interface through electron irradiation - electronic excitation process

    Science.gov (United States)

    Nagase, Takeshi; Yamashita, Ryo; Yabuuchi, Atsushi; Lee, Jung-Goo

    2015-11-01

    A Pd-Si amorphous phase was formed at a palladium/silicon oxide (Pd/SiOx) interface at room temperature by electron irradiation at acceleration voltages ranging between 25 kV and 200 kV. Solid-state amorphization was stimulated without the electron knock-on effects. The total dose required for the solid-state amorphization decreases with decreasing acceleration voltage. This is the first report on electron irradiation induced metallic amorphous formation caused by the electronic excitation at metal/silicon oxide interface.

  17. An amorphous phase formation at palladium / silicon oxide (Pd/SiOx interface through electron irradiation - electronic excitation process

    Directory of Open Access Journals (Sweden)

    Takeshi Nagase

    2015-11-01

    Full Text Available A Pd-Si amorphous phase was formed at a palladium/silicon oxide (Pd/SiOx interface at room temperature by electron irradiation at acceleration voltages ranging between 25 kV and 200 kV. Solid-state amorphization was stimulated without the electron knock-on effects. The total dose required for the solid-state amorphization decreases with decreasing acceleration voltage. This is the first report on electron irradiation induced metallic amorphous formation caused by the electronic excitation at metal/silicon oxide interface.

  18. SYNTHESIS AND PERFORMANCE OF FE-BASED AMORPHOUS ALLOYS FOR NUCLEAR WASTE REPOSITORY APPLICATIONS

    Energy Technology Data Exchange (ETDEWEB)

    Kaufman, L; Perepezko, J; Hildal, K

    2007-02-08

    In several Fe-based alloy systems it is possible to produce glasses with cooling rates as low as 100 K/s that exhibit outstanding corrosion resistance compared to typical crystalline alloys such as high-performance stainless steels and Ni-based C-22 alloy. Moreover, novel alloy compositions can be synthesized to maximize corrosion resistance (i.e. adding Cr and Mo) and to improve radiation compatibility (adding B) and still maintain glass forming ability. The applicability of Fe-based amorphous coatings in typical environments where corrosion resistance and thermal stability are critical issues has been examined in terms of amorphous phase stability and glass-forming ability through a coordinated computational analysis and experimental validation. Similarly, a novel computational thermodynamics approach has been developed to explore the compositional sensitivity of glass-forming ability and thermal stability. Also, the synthesis and characterization of alloys with increased cross-section for thermal neutron capture will be outlined to demonstrate that through careful design of alloy composition it is possible to tailor the material properties of the thermally spray-formed amorphous coating to accommodate the challenges anticipated in typical nuclear waste storage applications over tens of thousands of years in a variety of corrosive environments.

  19. Magnetocaloric response of amorphous and nanocrystalline Cr-containing Vitroperm-type alloys

    Science.gov (United States)

    Moreno-Ramírez, L. M.; Blázquez, J. S.; Franco, V.; Conde, A.; Marsilius, M.; Budinsky, V.; Herzer, G.

    2016-07-01

    The broad compositional range in which transition metal (TM) based amorphous alloys can be obtained, yields an easily tunable magnetocaloric effect (MCE) in a wide temperature range. In some TM-based alloys, anomalous behaviors are reported, as a non-monotonous trend with magnetic moment (e.g. FeZrB alloys). Moreover, in certain Cr-containing Vitroperm alloys anomalously high values of the magnetic entropy change were published. In this work, a systematic study on MCE response of Cr-containing amorphous alloys of composition Fe74-xCrxCu1Nb3Si15.5B6.5 (with x=2, 8, 10, 12, 13, 14 and 20) has been performed in a broad Curie temperature range from 100 K to 550 K. Curie temperature and magnetic entropy change peak of the amorphous alloys decrease with the increase of Cr content at rates of -25.6 K/at% Cr and -54 mJ kg-1 K-1/at% Cr, respectively, following a linear trend with the magnetic moment in both cases. The presence of nanocrystalline phases has been considered as a possible cause in order to explain the anomalies. The samples were nanocrystallized in different stages, however, the magnetocaloric response decreases as crystallization progresses due to the large separation of the Curie temperatures of the two phases.

  20. A Comparison of Photo-Induced Hysteresis Between Hydrogenated Amorphous Silicon and Amorphous IGZO Thin-Film Transistors.

    Science.gov (United States)

    Ha, Tae-Jun; Cho, Won-Ju; Chung, Hong-Bay; Koo, Sang-Mo

    2015-09-01

    We investigate photo-induced instability in thin-film transistors (TFTs) consisting of amorphous indium-gallium-zinc-oxide (a-IGZO) as active semiconducting layers by comparing with hydrogenated amorphous silicon (a-Si:H). An a-IGZO TFT exhibits a large hysteresis window in the illuminated measuring condition but no hysteresis window in the dark condition. On the contrary, a large hysteresis window measured in the dark condition in a-Si:H was not observed in the illuminated condition. Even though such materials possess the structure of amorphous phase, optical responses or photo instability in TFTs looks different from each other. Photo-induced hysteresis results from initially trapped charges at the interface between semiconductor and dielectric films or in the gate dielectric which possess absorption energy to interact with deep trap-states and affect the movement of Fermi energy level. In order to support our claim, we also perform CV characteristics in photo-induced hysteresis and demonstrate thermal-activated hysteresis. We believe that this work can provide important information to understand different material systems for optical engineering which includes charge transport and band transition. PMID:26716230

  1. Anomalous small-angle X-ray scattering of nanoporous two-phase atomistic models for amorphous silicon–germanium alloys

    Energy Technology Data Exchange (ETDEWEB)

    Chehaidar, A., E-mail: Abdallah.Chehaidar@fss.rnu.tn

    2015-09-15

    The present work deals with a detailed analysis of the anomalous small-angle X-ray scattering in amorphous silicon–germanium alloy using the simulation technique. We envisage the nanoporous two-phase alloy model consisting in a mixture of Ge-rich and Ge-poor domains and voids at the nanoscale. By substituting Ge atoms for Si atoms in nanoporous amorphous silicon network, compositionally heterogeneous alloys are generated with various composition-contrasts between the two phases. After relaxing the as-generated structure, we compute its radial distribution function, and then we deduce by the Fourier transform technique its anomalous X-ray scattering pattern. Using a smoothing procedure, the computed X-ray scattering patterns are corrected for the termination errors due to the finite size of the model, allowing so a rigorous quantitative analysis of the anomalous small-angle scattering. Our simulation shows that, as expected, the anomalous small-angle X-ray scattering technique is a tool of choice for characterizing compositional heterogeneities coexisting with structural inhomogeneities in an amorphous alloy. Furthermore, the sizes of the compositional nanoheterogeneities, as measured by anomalous small-angle X-ray scattering technique, are X-ray energy independent. A quantitative analysis of the separated reduced anomalous small-angle X-ray scattering, as defined in this work, provided a good estimate of their size.

  2. Reactive Infiltration of Silicon Melt Through Microporous Amorphous Carbon Preforms

    Science.gov (United States)

    Sangsuwan, P.; Tewari, S. N.; Gatica, J. E.; Singh, M.; Dickerson, R.

    1999-01-01

    The kinetics of unidirectional capillary infiltration of silicon melt into microporous carbon preforms have been investigated as a function of the pore morphology and melt temperature. The infiltrated specimens showed alternating bands of dark and bright regions, which corresponded to the unreacted free carbon and free silicon regions, respectively. The decrease in the infiltration front velocity for increasing infiltration distances, is in qualitative agreement with the closed-form solution of capillarity driven fluid flow through constant cross section cylindrical pores. However, drastic changes in the thermal response and infiltration front morphologies were observed for minute differences in the preforms microstructure. This suggests the need for a dynamic percolation model that would account for the exothermic nature of the silicon-carbon chemical reaction and the associated pore closing phenomenon.

  3. Synthesis and Performance of Fe-based Amorphous Alloys for Nuclear Waste Applications

    International Nuclear Information System (INIS)

    Recent developments in multi-component Fe-based amorphous alloys have shown that these novel materials exhibit outstanding corrosion resistance compared to typical crystalline alloys such as high-performance stainless steels and Ni-based C-22 alloy. During the past decade, amorphous alloy synthesis has advanced to allow for the casting of bulk metallic glasses. In several Fe-based alloy systems it is possible to produce glasses with cooling rates as low as 100 K/s. At such low cooling rates, there is an opportunity to produce amorphous solids through industrial processes such as thermal spray-formed coatings. Moreover, since cooling rates in typical thermal spray processing exceed 1000 K/s, novel alloy compositions can be synthesized to maximize corrosion resistance (i.e. adding Cr and Mo) and to improve radiation compatibility (adding B) and still maintain glass forming ability. The applicability of Fe-based amorphous coatings in typical environments where corrosion resistance and thermal stability are critical issues has been examined in terms of amorphous phase stability and glass-forming ability through a coordinated computational analysis and experimental validation. For example, a wedge casting technique has been applied to examine bulk glass forming alloys by combining multiple thermal probes with a measurement based kinetics analysis and a computational thermodynamics evaluation to elucidate the phase selection competition and critical cooling rate conditions. Based upon direct measurements and kinetics modeling it is evident that a critical cooling rate range should be considered to account for nucleation behavior and that the relative heat flow characteristics as well as nucleation kinetics are important in judging ease of glass formation. Similarly, a novel computational thermodynamics approach has been developed to explore the compositional sensitivity of glass-forming ability and thermal stability. Also, the synthesis and characterization of alloys

  4. Stability of (Fe-Tm-B) amorphous alloys: relaxation and crystallization phenomena

    International Nuclear Information System (INIS)

    Fe-Tm-B base (TM = transition metal) amorphous alloys (metallic glasses) are thermodynamically metastable. This limits their use as otherwise favourable materials, e.g. magnetically soft, corrosion resistant and mechanically firm. By analogy of the mechanical strain-stress dependence, at a certain degree of thermal activation the amorphous structure reaches its limiting state where it changes its character and physical properties. Relaxation and early crystallization processes in amorphous alloys, starting already around 100 C, are reviewed involving subsequently stress relief, free volume shrinking, topological and chemical ordering, pre-crystallization phenomena up to partial (primary) crystallization. Two diametrically different examples are demonstrated from among the soft magnetic materials: relaxation and early crystallization processes in the Fe-Co-B metallic glasses and controlled crystallization of amorphous ribbons yielding rather modern nanocrystalline ''Finemet'' alloys where late relaxation and pre-crystallization phenomena overlap when forming extremely dispersive and fine-grained nanocrystals-in-amorphous-sauce structure. Moessbauer spectroscopy seems to be unique for magnetic and phase analysis of such complicated systems. (orig.)

  5. Copper-Silicon-Magnesium Alloys for Latent Heat Storage

    Science.gov (United States)

    Gibbs, P. J.; Withey, E. A.; Coker, E. N.; Kruizenga, A. M.; Andraka, C. E.

    2016-06-01

    The systematic development of microstructure, solidification characteristics, and heat of solidification with composition in copper-silicon-magnesium alloys for thermal energy storage is presented. Differential scanning calorimetry was used to relate the thermal characteristics to microstructural development in the investigated alloys and clarifies the location of one of the terminal three-phase eutectics. Repeated thermal cycling highlights the thermal storage stability of the transformation through multiple melting events. Two near-terminal eutectic alloys display high enthalpies of solidification, relatively narrow melting ranges, and stable transformation hysteresis behaviors suited to thermal energy storage.

  6. Microstructural tuning of polycrystalline silicon films from hydrogen diluted amorphous silicon films by AIC

    Energy Technology Data Exchange (ETDEWEB)

    Prathap, P.; Tuzun, O.; Roques, S.; Schmitt, S.; Slaoui, A. [InESS, CNRS-UdS, Strasbourg Cedex-2 (France); Maurice, C. [SMS Centre, UMR CNRS 5146, Ecole des Mines de Saint Etienne, 158 Cours Fauriel, 42023 Saint Etienne Cedex 2 (France)

    2011-03-15

    In the present study, the effect of hydrogen dilution in amorphous silicon on its crystallization kinetics and defect distribution using AIC has been studied. The a -Si films were deposited at different ratios of H{sub 2}/(H{sub 2}+SiH{sub 4}) using plasma enhanced chemical vapour deposition (ECR-PECVD) on glass-ceramic substrates. The thicknesses of aluminium and a -Si:H films were 0.20 {mu}m and 0. 37 {mu}m, respectively. The bi-layer structures were annealed in a tube furnace at 475 C for 8 hours in a nitrogen atmosphere. The results indicated that as the hydrogen dilution for a -Si:H films increased from 0% to 85%, the AIC grown poly-Si films were more stressed compressively, while the Raman peak broadened from 6.7 cm{sup -1} to 8.6 cm{sup -1}. It was found that the initiation of crystallization temperature as well as microstructure of poly-Si films was dramatically influenced by the hydrogen content in precursor a -Si films. The distribution of microstructural defects analysed by Electron Back Scattering Diffraction (EBSD) method indicated that frequency of low angle grain boundaries (LAGB) were more at higher hydrogen dilution ratios while coincident site lattice boundaries (CSL) of first order ({sigma}3), second order ({sigma}9) and third order ({sigma}27) were less sensitive to the hydrogen dilutions/content (copyright 2011 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

  7. Evidence of eutectic crystallization and transient nucleation in Al89La6Ni5 amorphous alloy

    DEFF Research Database (Denmark)

    Zhuang, Yanxin; Jiang, Jianzhong; Lin, Z. G.; Mezouar, M.; Crichton, W.; Inoue, A.

    2001-01-01

    The phase evolution with the temperature and time in the process of crystallization of Al89La6Ni5 amorphous alloy has been investigated by in situ high-temperature and high-pressure x-ray powder diffraction using synchrotron radiation. Two crystalline phases, fcc-Al and a metastable bcc-(AlNi)(11...

  8. Electro-oxidation of ethylene glycol on nanoporous Ti-Cu amorphous alloy

    Energy Technology Data Exchange (ETDEWEB)

    Chen Cuijie [School of Materials Science and Engineering, Tianjin University, Tianjin 300072 (China); Zhu Shengli, E-mail: slzhu@tju.edu.cn [School of Materials Science and Engineering, Tianjin University, Tianjin 300072 (China); Tianjin Key Laboratory of Composite and Functional Materials, Tianjin 300072 (China); Yang Xianjin [School of Materials Science and Engineering, Tianjin University, Tianjin 300072 (China); Tianjin Key Laboratory of Composite and Functional Materials, Tianjin 300072 (China); Pi Lele; Cui Zhenduo [School of Materials Science and Engineering, Tianjin University, Tianjin 300072 (China)

    2011-11-30

    Highlights: > Nanoporous Ti-Cu amorphous alloy exhibits apparent EG electrocatalytic ability EG electro-oxidation occurs more easily in alkaline medium than in acid medium. > In acid medium, heat treatment plays an enhancing role towards EG oxidation. > In alkaline medium, heat treatment has opposite effect below and above 0.1 V. - Abstract: This work describes ethylene glycol (EG) electro-oxidation over nanoporous structure catalyst prepared by dealloying Ti-Cu amorphous alloy. Scanning electron microscopy (SEM) was used to characterize nanoporous catalysts. Electrocatalytic performances in acid and alkaline mediums were measured by cyclic voltammetry (CV), chronoamperometry (CA) and electrochemical impedance spectroscopy (EIS). The results showed that nanoporous Ti-Cu amorphous alloy exhibited apparent electrocatalytic ability in terms of higher oxidation current in CV and CA curves comparing to raw Ti-Cu amorphous alloy. Electro-oxidation of EG took place more easily in alkaline medium than that in acid medium. In acid medium, heat treatment improved the electrocatalytic activity of nanoporous catalyst. In alkaline medium, heat treatment played an enhancing role below 0.1 V and a depressing role above 0.1 V. Possible electro-oxidation mechanism of EG was also discussed.

  9. Crystallization behavior of amorphous Zr70Cu20Ni10 alloy annealed at 380℃

    Institute of Scientific and Technical Information of China (English)

    王焕荣; 叶以富; 闵光辉; 张均艳; 滕新营; 石志强

    2002-01-01

    Crystallization behavior of amorphous Zr70Cu20Ni10 alloy isothermally annealed at 380℃ was first investigated by employing the differential scanning calorimetry (DSC) and transmission electron microscopy (TEM). It has been found that an exothermic peak appears in the DSC trace when the annealing time is about 17~18min, indicating a certain phase transformation occurs in the matrix of amorphous Zr70Cu20Ni10 alloy. Meanwhile, isothermal annealing experiments for amorphous Zr70Cu20Ni10 alloy ranging from 360℃ to 400℃ with a temperature interval of 10℃ were also carried out, from which no exothermic reaction can be observed except for the case of 380℃. This behavior indicates that the phase transformation during isothermal annealing of amorphous Zr70Cu20Ni10 alloy is strongly temperature- and time-dependent. Further investigations are required to reveal the nature of such phenomenon.

  10. The magnetic properties and the Barkhausen noise of the hydrogenated Fe-V-B amorphous alloy

    International Nuclear Information System (INIS)

    As a consequence of hydrogenation-dehydrogenation process, in the present paper the study of structural changes which could be followed by measuring structure sensitive magnetic properties as the stress induced anisotropy, coercive force, demagnetizing factor and the Barkhausen noise parameters of the as-cast and hydrogenated Fe80V5B15 amorphous alloys is performed. (author)

  11. Thermally induced crystallization of amorphous Fe40Ni40P14B6 alloy

    Czech Academy of Sciences Publication Activity Database

    Vasić, M.; Blagojević, V. A.; Begović, N. N.; Žák, Tomáš; Pavlović, V. B.; Minić, Dragica M.

    2015-01-01

    Roč. 614, AUG (2015), s. 129-136. ISSN 0040-6031 R&D Projects: GA MŠk(CZ) ED1.1.00/02.0068 Institutional support: RVO:68081723 Keywords : Amorphous alloy * Crystallization * Kinetics * Deconvolution * Impingement * Surface morphology Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 2.184, year: 2014

  12. Application of the artificial neural networks for prediction of magnetic saturation of metallic amorphous alloys

    Directory of Open Access Journals (Sweden)

    J. Konieczny

    2008-04-01

    Full Text Available Purpose: The aim of the work is to employ the artificial neural networks for prediction of magnetic saturation ofthe amorphous alloys with the iron and cobalt matrix.Design/methodology/approach: It has been assumed that the artificial neural networks can be used toassign the relationship between the chemical compositions of amorphous alloys, temperature of heat treatment andmagnetic saturation. In order to determine the relationship it has been necessary to work out a suitable calculationmodel. It has been proved that employment of genetic algorithm to selection of input neurons can be very usefultool to improve artificial neural network calculation results. The attempt to use the artificial neural networks forpredicting the effect of the chemical composition and temperature of heat treatment on the magnetic saturation BSsucceeded, as the level of the obtained results was acceptable.Findings: Artificial neural networks, can be applied for predicting the effect of the chemical composition andtemperature of heat treatment on the magnetic saturation.Research limitations/implications: Worked out model should be used for prediction of magnetic saturationonly in particular groups of amorphous alloys, mostly because of the discontinuous character of input data.Practical implications: The results of research make it possible to calculate with a certain admissible error the magneticsaturation Bs value basing on combinations of concentrations of the particular elements and heat treatment temperature.Originality/value: In this paper it has been presented an original trial of prediction of the required magneticproperties of the iron and cobalt amorphous alloys.

  13. Diffusion of 59Fe in amorphous Co79Nb14B7 alloy

    International Nuclear Information System (INIS)

    Amorphous alloys have attracted considerable scientific and technological interest because of their unusual properties. Unfortunately, amorphous alloys are not thermodynamically stable and undergo structural transitions, such as relaxation, phase separation, and crystallization, which remarkably change their properties. Diffusion plays a dominant role in these processes. The crucial problem in carrying out direct diffusion measurements is that diffusion lengths are limited to very short distances, typically about 10 nm, to avoid any undesirable structural transition. Therefore only those experimental methods having a very good depth resolution can be used. Such a method is ion sputtering for serial sectioning, which is mostly used in combination with the radiotracer technique or secondary ion mass spectrometry. In the present paper, the iron impurity diffusion in the same amorphous alloy Co79Nb14B7 is studied. The temperature dependence of 59Fe impurity diffusion coefficients in the relaxed amorphous alloy have been compared with that of 58 Co self-diffusion coefficients determined in. Two procedures of the sample prepared were tested to check the influence of the experimental techniques on the resulting diffusion coefficients

  14. AuPd CATALYTIC NANOPARTICLE SIZE EFFECT ON THE FORMATION OF AMORPHOUS SILICON NANOWIRES

    Institute of Scientific and Technical Information of China (English)

    LIU ZU-QIN; SUN LIAN-FENG; TANG DONG-SHENG; ZHOU WEI-YA; LI YU-BAO; Zou XIAO-PING

    2000-01-01

    Amorphous silicon (a-Si) nanowires have been prepared on SiO2/Si substrates by AuPd nanoparticles / silane reaction method. Field-emission scanning electron microscopy and transmission electron microscopy were used to characterize the samples. The typical a-Si nanowires we obtained are of a uniform diameter about 20 nm and length up to several micrometers. The growth mechanism of the nanowires seems to be the vapor-liquid-solid mechanism. The catalytic particle size effect on the formation of the nanowires and the cause of forming amorphous state Si nanowires are discussed.

  15. Formation and structure of V-Zr amorphous alloy thin films

    KAUST Repository

    King, Daniel J M

    2015-01-01

    Although the equilibrium phase diagram predicts that alloys in the central part of the V-Zr system should consist of V2Zr Laves phase with partial segregation of one element, it is known that under non-equilibrium conditions these materials can form amorphous structures. Here we examine the structures and stabilities of thin film V-Zr alloys deposited at room temperature by magnetron sputtering. The films were characterized by X-ray diffraction, transmission electron microscopy and computational methods. Atomic-scale modelling was used to investigate the enthalpies of formation of the various competing structures. The calculations confirmed that an amorphous solid solution would be significantly more stable than a random body-centred solid solution of the elements, in agreement with the experimental results. In addition, the modelling effort provided insight into the probable atomic configurations of the amorphous structures allowing predictions of the average distance to the first and second nearest neighbours in the system.

  16. Molecular dynamics simulation of amorphous segregation inAg-Rh alloys

    Institute of Scientific and Technical Information of China (English)

    ZHANG Jingxiang; BIAN Xiufang

    2003-01-01

    Molecular dynamics simulation was carried out to investigate the liquid and amorphous microstructures of binary Agx-Rh(100-x) (x = 25, 50, 75 in atom fraction) alloys. Segregation feature of homogeneous interatomic binding of Ag-Rh liquid was found and probed, which can be retained into amorphous solids upon rapid cooling. Homogeneous binding may occur when the difference in the elemental atomic sizes is less than 10%. The icosahedra in liquid before the formation of amorphous state exist in a stable state and the network formed by 1551-clusters in molten alloys would inhibit the crystallization and diffusion of atoms. A higher degree of 155 1-clusters will be favorable to form metallic glasses.

  17. Formation and structure of V–Zr amorphous alloy thin films

    International Nuclear Information System (INIS)

    Although the equilibrium phase diagram predicts that alloys in the central part of the V–Zr system should consist of V2Zr Laves phase with partial segregation of one element, it is known that under non-equilibrium conditions these materials can form amorphous structures. Here we examine the structures and stabilities of thin film V–Zr alloys deposited at room temperature by magnetron sputtering. The films were characterized by X-ray diffraction, transmission electron microscopy and computational methods. Atomic-scale modelling was used to investigate the enthalpies of formation of the various competing structures. The calculations confirmed that an amorphous solid solution would be significantly more stable than a random body-centred solid solution of the elements, in agreement with the experimental results. In addition, the modelling effort provided insight into the probable atomic configurations of the amorphous structures allowing predictions of the average distance to the first and second nearest neighbours in the system

  18. The properties of silicon alloyed ferritic ductile irons

    Directory of Open Access Journals (Sweden)

    Z. Glavas

    2016-07-01

    Full Text Available In this paper the influence of silicon content of 3,1 to 5,4 wt. % on the tensile properties, hardness and impact energy of ferritic ductile iron was analysed. It was found that silicon strengthens the ferrite, resulting in an increase in yield strength and tensile strength with increasing silicon content up to 4,22 wt. %. Elongation and impact energy decreases and the hardness increases with increasing silicon content. Since ferritic ductile irons alloyed and strengthened by silicon have a higher Rp0,2/Rm ratio and a higher elongation than conventional ferritic, ferritic/pearlitic and pearlitic ductile irons at the same level of tensile strength, we can expect an increased demand for these materials in applications where high resistance to impact load and low temperature impact properties are not required.

  19. Dielectric relaxation and hydrogen diffusion in amorphous silicon

    Energy Technology Data Exchange (ETDEWEB)

    Phillips, J.C. (AT and T Bell Labs., Murray Hill, NJ (United States))

    1994-04-01

    Hydrogen diffusion is technologically critical to the processing of amorphous Si for solar cell applications. It is shown that this diffusion belongs to a broad class of dielectric relaxation mechanisms which were first studied by Kohlrausch in 1847. A microscopic theory of the Kohlrausch relaxation constant [beta][sub K] is also constructed. This theory explains the values of [beta] observed in many electronic, molecular and polymeric relaxation processes. It is based on two novel concepts: Wiener sausages, from statistical mechanics, and the magic wand, from axiomatic set theory

  20. Evidence of chemical ordering in amorphous hydrogenated silicon carbide

    International Nuclear Information System (INIS)

    Amorphous Si/sub 0.68/C/sub 0.32/:H prepared by radio frequency glow discharge from a mixture of methane and silane was studied by means of the complementary techniques of electron energy-loss spectroscopy and electron diffraction. The experimental results are consistent with Si and C forming a tetrahedral network with nearest neighbor distances similar to those in crystalline Si and crystalline SiC. There is evidence that the C atoms tend to be surrounded by four Si atoms rather than a random distribution of C and Si on the tetrahedral network

  1. Domain structure and Barkhausen effect in Fe78B12Si9Ni1 amorphous alloy

    International Nuclear Information System (INIS)

    Domain structure is investigated by using new approaches, which are based on registration of micro-volume material magnetization. One demonstrated absence of correlation of dimensions of domain structure elements of Fe78B12Si9Ni1 magnetically soft alloy in initial state upon hydrogen saturation or annealing with the Barkhausen effect characteristics in the mentioned alloy. It is pointed out that conventional view of the Barkhausen effect the nature of which is linked with domain dimensions and mobility of their boundaries, are not true in disordered structures represented by magnetically soft amorphous metal alloys

  2. Volume and surface magnetic anisotropy of Co75Fe5Si4B16 amorphous alloy

    International Nuclear Information System (INIS)

    Magnetic parameters and processes of mentioned in the title amorphous alloy and its surface layer remagnetization in initial freshly-quenched state after thermomagnetic treatment (TMT) and under the effect of extermnal extension stresses are investigated. The ascertained differences in the values of coercive force and constants of magnetic anisotropy on the surface and in the volume of the alloy testify to the level character of magnetic anisotropy (MA), which is determined by the differences in magnetoelastic energy of local quenching stresses in material microvolumes. Owing to high deficiency of the surface layers, their MA, in cotrast to the alloy volume, is not monoaxial even as a result of optimal model of TMT

  3. Annealing temperature effect on microstructure, magnetic and microwave properties of Fe-based amorphous alloy powders

    International Nuclear Information System (INIS)

    Fe74Ni3Si13Cr6W4 amorphous alloy powders were annealed at different temperature (T) for 1.5 h to fabricate the corresponding amorphous and nanocrystalline powders. The influences of T on the crystalline structure, morphology, magnetic and microwave electromagnetic properties of the resultant samples were investigated via X-ray diffraction, scanning electron microscopy, vibrating sample magnetometer and vector network analyzer. The results show that the powder samples obtained at T of 650 °C or more are composed of lots of ultra-fine α-Fe(Si) grains embedded in an amorphous matrix. When T increases from 350 to 750 °C, the saturated magnetization and coercivity of the as-annealed powder samples both increase monotonously whereas the relative real permittivity shows a minimal value and the relative real permeability shows a maximal value at T of 650 °C. Thus the powder samples annealed at 650 °C show optimal reflection loss under −10 dB in the whole C-band. These results here suggest that the annealing heat treatment of Fe-based amorphous alloy is an effective approach to fabricate high performance microwave absorber with reasonable permittivity and large permeability simultaneously via adjusting T. - Highlights: ► The annealing temperature effect of Fe-based amorphous alloy was studied. ► Fe-based amorphous and nanocrystalline alloy has a good absorbing property in C-band. ► There exists a correspondence between microwave properties and microstructure.

  4. Study made of ductility limitations of aluminum-silicon alloys

    Science.gov (United States)

    Bailey, W. A.; Frederick, S. F.

    1967-01-01

    Study of the relation between microstructure and mechanical properties of aluminum-silicon alloys determines the cause of the variations in properties resulting from differences in solidification rate. It was found that variations in strength are a consequence of variations in ductility and that ductility is inversely proportional to dendrite cell size.

  5. Silicon nitride and intrinsic amorphous silicon double antireflection coatings for thin-film solar cells on foreign substrates

    International Nuclear Information System (INIS)

    Hydrogenated intrinsic amorphous silicon (a-Si:H) was investigated as a surface passivation method for crystalline silicon thin film solar cells on graphite substrates. The results of the experiments, including quantum efficiency and current density-voltage measurements, show improvements in cell performance. This improvement is due to surface passivation by an a-Si:H(i) layer, which increases the open circuit voltage and the fill factor. In comparison with our previous work, we have achieved an increase of 0.6% absolute cell efficiency for a 40 μm thick 4 cm2 aperture area on the graphite substrate. The optical properties of the SiNx/a-Si:H(i) stack were studied using spectroscopic ellipsometer techniques. Scanning transmission electron microscopy inside a scanning electron microscope was applied to characterize the cross section of the SiNx/a-Si:H(i) stack using focus ion beam preparation. - Highlights: • We report a 10.8% efficiency for thin-film silicon solar cell on graphite. • Hydrogenated intrinsic amorphous silicon was applied for surface passivation. • SiNx/a-Si:H(i) stacks were characterized by spectroscopic ellipsometer techniques. • Cross-section micrograph was obtained by scanning transmission electron microscopy. • Quantum efficiency and J-V measurements show improvements in the cell performance

  6. Silicon nitride and intrinsic amorphous silicon double antireflection coatings for thin-film solar cells on foreign substrates

    Energy Technology Data Exchange (ETDEWEB)

    Li, Da; Kunz, Thomas [Bavarian Center for Applied Energy Research (ZAE Bayern), Division: Photovoltaics and Thermosensoric, Haberstr. 2a, 91058 Erlangen (Germany); Wolf, Nadine [Bavarian Center for Applied Energy Research (ZAE Bayern), Division: Energy Efficiency, Am Galgenberg 87, 97074 Wuerzburg (Germany); Liebig, Jan Philipp [Materials Science and Engineering, Institute I, University of Erlangen-Nuremberg, Martensstr. 5, 91058 Erlangen (Germany); Wittmann, Stephan; Ahmad, Taimoor; Hessmann, Maik T.; Auer, Richard [Bavarian Center for Applied Energy Research (ZAE Bayern), Division: Photovoltaics and Thermosensoric, Haberstr. 2a, 91058 Erlangen (Germany); Göken, Mathias [Materials Science and Engineering, Institute I, University of Erlangen-Nuremberg, Martensstr. 5, 91058 Erlangen (Germany); Brabec, Christoph J. [Bavarian Center for Applied Energy Research (ZAE Bayern), Division: Photovoltaics and Thermosensoric, Haberstr. 2a, 91058 Erlangen (Germany); Institute of Materials for Electronics and Energy Technology, University of Erlangen-Nuremberg, Martensstr. 7, 91058 Erlangen (Germany)

    2015-05-29

    Hydrogenated intrinsic amorphous silicon (a-Si:H) was investigated as a surface passivation method for crystalline silicon thin film solar cells on graphite substrates. The results of the experiments, including quantum efficiency and current density-voltage measurements, show improvements in cell performance. This improvement is due to surface passivation by an a-Si:H(i) layer, which increases the open circuit voltage and the fill factor. In comparison with our previous work, we have achieved an increase of 0.6% absolute cell efficiency for a 40 μm thick 4 cm{sup 2} aperture area on the graphite substrate. The optical properties of the SiN{sub x}/a-Si:H(i) stack were studied using spectroscopic ellipsometer techniques. Scanning transmission electron microscopy inside a scanning electron microscope was applied to characterize the cross section of the SiN{sub x}/a-Si:H(i) stack using focus ion beam preparation. - Highlights: • We report a 10.8% efficiency for thin-film silicon solar cell on graphite. • Hydrogenated intrinsic amorphous silicon was applied for surface passivation. • SiN{sub x}/a-Si:H(i) stacks were characterized by spectroscopic ellipsometer techniques. • Cross-section micrograph was obtained by scanning transmission electron microscopy. • Quantum efficiency and J-V measurements show improvements in the cell performance.

  7. Band offsets between amorphous La2Hf2O7 and silicon

    Institute of Scientific and Technical Information of China (English)

    CHENG Xuerui; WANG Yongqiang; QI Zeming; ZHANG Guobin; WANG Yuyin; SHAO Tao; ZHANG Wenhua

    2012-01-01

    Amorphous La2Hf2O7 films were grown on Si(100) by pulsed laser deposition method.The valence and conduction band offsets between amorphous La2Hf2O7 film and silicon were determined by using synchrotron radiation photoemission spectroscopy.The energy band gap of amorphous La2Hf2O7 film was measured from the energy-loss spectra of O 1s photoelectrons.The band gap of amorphous La2Hf2O7 film was determined to be 5.4±0.2 eV.The valence and the conduction-band offsets of amorphous La2Hf2O7 film to Si were obtained to be 2.7±0.2 and 1.6±0.2 eV,respectively.These results indicated that the amorphous La2Hf2O7 film could be one promising candidate for high-k gate dielectrics.

  8. 57Fe NMR study of amorphous and rapidly quenched crystalline Fe-B alloys

    Science.gov (United States)

    Pokatilov, V. S.

    2009-01-01

    Amorphous and crystalline Fe-B alloys (5-25 at % B) were studied using pulsed 57Fe nuclear magneticr esonance at 4.2 K. The alloy samples were prepared from a mixture of the 57Fe and 10B isotopes by rapid quenching from the melt. In the microcrystalline Fe-(5-12 at %) B alloys, the resonance frequencies were measured for local states of 57Fe nuclei in the tetragonal and orthorhombic Fe3B phases and also in α-Fe. The resonance frequencies characteristic of 57Fe nuclei in α-Fe crystallites with substitutional impurity boron atoms in the nearest neighborhood were also revealed. In the resonance frequency distribution P( f) in the amorphous Fe-(18-25) at % B alloys, there are frequencies corresponding to local Fe atom states with short-range order of the tetragonal and orthorhombic Fe3B phases. As the boron content decreases below 18 at %, the P( f) distributions are shifted to higher frequencies corresponding to 57Fe NMR for atoms exhibiting a short-range order of the α-Fe type. The local magnetic structure of the amorphous Fe-B alloys is also considered.

  9. Wear mechanism of electrodeposited amorphous Ni-Fe-P alloys

    Institute of Scientific and Technical Information of China (English)

    高诚辉; 赵源

    2004-01-01

    The wear mechanism of amorphous Ni-Fe-P coating was discussed. The wear resistance of the amor phous Ni-Fe-P coatings was tested on a Timken wear apparatus, and the wear track of the amorphous Ni-Fe-P coat ings as-deposited and heated at various temperatures was observed by SEM. The results show that the wear resistthe coating will change with the heating temperature increasing from pitting+plowing at 200 ℃ to pitting at 400 ℃,and to plowing at 600 ℃. The pits on the worn surface of the amorphous Ni-Fe-P coating result from the tribo-fatigue fracture. The cracks of spalling initiate at pits and propagate at certain angle with the sliding direction on sur face, and then extend into sub-surface along the poor P layers or the interface between layers. Finally under repeated action of the stress in the rubbing process the cracks meet and the debris forms. The generation of the pits and spal-ling is related with the internal stress, brittleness and layer structure of the amorphous Ni-Fe-P coating.

  10. Spatially localized current-induced crystallization of amorphous silicon films

    Czech Academy of Sciences Publication Activity Database

    Rezek, Bohuslav; Šípek, Emil; Ledinský, Martin; Krejza, P.; Stuchlík, Jiří; Fejfar, Antonín; Kočka, Jan

    2008-01-01

    Roč. 354, 19-25 (2008), s. 2305-2309. ISSN 0022-3093 R&D Projects: GA MŠk(CZ) LC06040; GA AV ČR KAN400100701; GA MŠk LC510 Institutional research plan: CEZ:AV0Z10100521 Keywords : silicon * crystallization * atomic force and scanning tunneling microscopy * nanocrystals Subject RIV: BM - Solid Matter Physics ; Magnetism Impact factor: 1.449, year: 2008

  11. Enhanced Multiple Exciton Generation in Amorphous Silicon Nanoparticles

    OpenAIRE

    Kryjevski, Andrei; Kilin, Dmitri

    2014-01-01

    Multiple exciton generation (MEG) in nanometer-sized hydrogen-passivated silicon nanowires (NWs), and quasi two-dimensional nanofilms strongly depends on the degree of the core structural disorder as shown by the many-body perturbation theory (MBPT) calculations based on the density functional theory (DFT) simulations. Working to the second order in the electron-photon coupling and in the screened Coulomb interaction we calculate quantum efficiency (QE), the average number of excitons created...

  12. Amorphous structure in a laser clad Ni-Cr-Al coating on Al-Si alloy

    Institute of Scientific and Technical Information of China (English)

    2000-01-01

    A mixing microstructure containing Ni-based amorphous structures was observed by TEM in the laser cladzones. As the uniformity of chemical composition and temperature is poor in the laser cladding, the amorphous structurewith some Ni3Al crystals coexists in the cladding. The microhardness of the mixing amorphous structure is HV 600 ~800, which is lower than that of crystal phases in the coating. Differential thermal analysis (DTA) shows that Ni-basedamorphous structure exhibits a higher initial crystallizing temperature (about 588 ℃ ), which is slightly higher than that ofthe eutectic temperature of Al-Si alloy. The wear test results indicate that there are some amorphous structures in the laserclad coating, which reduces the peeling of the granular phases from matrix, and improves the wear resistance

  13. In situ probing of surface hydrides on hydrogenated amorphous silicon using attenuated total reflection infrared spectroscopy

    CERN Document Server

    Kessels, W M M; Sanden, M C M; Aydil, E S

    2002-01-01

    An in situ method based on attenuated total reflection Fourier transform infrared spectroscopy (ATR-FTIR) is presented for detecting surface silicon hydrides on plasma deposited hydrogenated amorphous silicon (a-Si:H) films and for determining their surface concentrations. Surface silicon hydrides are desorbed by exposing the a-Si:H films to low energy ions from a low density Ar plasma and by comparing the infrared spectrum before and after this low energy ion bombardment, the absorptions by surface hydrides can sensitively be separated from absorptions by bulk hydrides incorporated into the film. An experimental comparison with other methods that utilize isotope exchange of the surface hydrogen with deuterium showed good agreement and the advantages and disadvantages of the different methods are discussed. Furthermore, the determination of the composition of the surface hydrogen bondings on the basis of the literature data on hydrogenated crystalline silicon surfaces is presented, and quantification of the h...

  14. In Situ Nanocrystallization-Induced Hardening of Amorphous Alloy Matrix Composites Consolidated by Spark Plasma Sintering

    Science.gov (United States)

    Singh, Ashish; Paul, Tanaji; Katakam, Shravana; Dahotre, Narendra B.; Harimkar, Sandip P.

    2016-07-01

    In situ nanocrystallization of amorphous alloys has recently emerged as a suitable technique for forming nanocomposites with improved mechanical properties. In this paper, we report on the spark plasma sintering (SPS) of Fe-based amorphous alloys with in situ-formed nanocrystals of (Fe,Cr)23(C,B)6. The SPS was performed with a range of sintering temperatures (570-800°C) in and above the supercooled liquid region of the alloy. Significant enhancement in relative density was observed with increasing sintering temperature due to particle deformation and improved interparticle contacts. The formation of nanocrystalline particles and enhanced densification resulted in an increase in the hardness of the nanocomposites from about 1150-1375 VHN.

  15. Model calculations of thermodynamic functions of crystallization of Co-B amorphous alloys

    International Nuclear Information System (INIS)

    A model of perfectly associated solution is used for the approximation of the properties of metal melts. The calculation programs are prepared for modelling thermodynamic properties of solutions on the basis of the model of perfectly associated solution, which programs can enable optimizational calculation relying on the results of several series of experiments. Co-B liquid alloys are modelled using all available in the literature experimental data. Estimated values ΔcrH = 10 kJ/mol; ΔcrS = -2 J/(K mol); ΔcrG = -9 kJ/mol are obtained for the crystallization of amorphous Co0.815B0.185 alloy. The calculated value of amorphous alloy crystallization enthalpy is compared with the literature data. 17 refs., 1 tab

  16. Mg amorphous alloys for biodegradable implants; Ligas amorfas de magnesio utilizadas em implantes consumiveis

    Energy Technology Data Exchange (ETDEWEB)

    Danez, G.P., E-mail: gabidanez@hotmail.co [Universidade Federal de Sao Carlos (PPG-CEMUFSCar), SP (Brazil). Programa de Pos-Graduacao em Ciencia e Engenharia de Materiais; Koga, G.Y.; Tonucci, S.; Bolfarini, C.; Kiminami, C.S.; Botta Filho, W.J. [Universidade Federal de Sao Carlos (DEMa/UFSCar), SP (Brazil). Dept. de Engenharia de Materiais

    2010-07-01

    The use of implants made from amorphous alloys magnesium-based with additions of zinc and calcium are promising. Properties such as biocompatibility, low density, high mechanical strength, low modulus (as compared to alloys such as stainless steel and titanium), corrosion resistance and wear resistance make it attractive for use in implants. Moreover, the by-products of corrosion and wear are not toxic and may contribute to fixation. Aiming to understand the tendency of this amorphous ternary (Mg-Zn-Ca) and expand the information about this system, this work involved the use of the topological criterion of instability ({lambda}) and the criterion of electronegativity ({Delta}e) to the choice of compositions. The alloys were processed into wedge-shaped and analyzed structurally and in X-ray diffraction and scanning electron microscopy. (author)

  17. Studies on the reactive melt infiltration of silicon and silicon-molybdenum alloys in porous carbon

    Science.gov (United States)

    Singh, M.; Behrendt, D. R.

    1992-01-01

    Investigations on the reactive melt infiltration of silicon and silicon-1.7 and 3.2 at percent molybdenum alloys into porous carbon preforms have been carried out by process modeling, differential thermal analysis (DTA) and melt infiltration experiments. These results indicate that the initial pore volume fraction of the porous carbon preform is a critical parameter in determining the final composition of the raction-formed silicon carbide and other residual phases. The pore size of the carbon preform is very detrimental to the exotherm temperatures due to liquid silicon-carbon reactions encountered during the reactive melt infiltration process. A possible mechanism for the liquid silicon-porous (glassy) carbon reaction has been proposed. The composition and microstructure of the reaction-formed silicon carbide has been discussed in terms of carbon preform microstructures, infiltration materials, and temperatures.

  18. Innovative Characterization of Amorphous and Thin-Film Silicon for Improved Module Performance: 1 February 2005 - 31 July 2008

    Energy Technology Data Exchange (ETDEWEB)

    Taylor, P. C.; Williams, G. A.

    2009-09-01

    Electron spin resonance and nuclear magnetic resonance was done on amorphous silicon samples (modules with a-Si:H and a-SixGe1-x:H intrinsic layer) to study defects that contribute to Staebler-Wronski effect.

  19. Plasma-initiated rehydrogenation of amorphous silicon to increase the temperature processing window of silicon heterojunction solar cells

    Science.gov (United States)

    Shi, Jianwei; Boccard, Mathieu; Holman, Zachary

    2016-07-01

    The dehydrogenation of intrinsic hydrogenated amorphous silicon (a-Si:H) at temperatures above approximately 300 °C degrades its ability to passivate silicon wafer surfaces. This limits the temperature of post-passivation processing steps during the fabrication of advanced silicon heterojunction or silicon-based tandem solar cells. We demonstrate that a hydrogen plasma can rehydrogenate intrinsic a-Si:H passivation layers that have been dehydrogenated by annealing. The hydrogen plasma treatment fully restores the effective carrier lifetime to several milliseconds in textured crystalline silicon wafers coated with 8-nm-thick intrinsic a-Si:H layers after annealing at temperatures of up to 450 °C. Plasma-initiated rehydrogenation also translates to complete solar cells: A silicon heterojunction solar cell subjected to annealing at 450 °C (following intrinsic a-Si:H deposition) had an open-circuit voltage of less than 600 mV, but an identical cell that received hydrogen plasma treatment reached a voltage of over 710 mV and an efficiency of over 19%.

  20. Structure and thermal stability of biodegradable Mg–Zn–Ca based amorphous alloys synthesized by mechanical alloying

    International Nuclear Information System (INIS)

    Room temperature solid state diffusion reaction induced by mechanical alloying (MA) of elemental blends of Mg, Zn and Ca of nominal composition 60 at.% Mg–35 at.% Zn–5 at.% Ca has been studied. Formation of fully amorphous structure has been identified after 5 h of MA performed in a SPEX 8000M shaker mill, with milling continued up to 8 h to confirm the formation of homogeneous amorphous phase. Thermal stability of the amorphous phase has been studied using differential scanning calorimetry (DSC) and isothermal heat treatment at different temperatures. The amorphous powder consolidated using cold isostatic pressing (CIP) showed an envelope density ∼80% of absolute density, which increased to an envelope density ∼84% of absolute density after sintering at an optimized temperature of ∼523 K for 9 h. Electrochemical bio-corrosion testing of the CIP compacted amorphous pellet as well as the sintered pellet performed in Dulbecco's Modified Eagle Medium, showed improved corrosion resistance in comparison to the as-cast pure Mg. Cytotoxicity testing of the CIP compacted amorphous pellet, performed using the MTT assay with MC3T3 osteoblastic cells, showed low cytotoxicity in comparison to the as-cast pure Mg.