WorldWideScience

Sample records for submicron material masks

  1. Mask materials for powder blasting

    NARCIS (Netherlands)

    Wensink, H.; Jansen, Henricus V.; Berenschot, Johan W.; Elwenspoek, Michael Curt

    Powder blasting, or abrasive jet machining (AJM), is a technique in which a particle jet is directed towards a target for mechanical material removal. It is a fast, cheap and accurate directional etch technique for brittle materials such as glass, silicon and ceramics. The particle jet (which

  2. Submicron organic nanofiber devices with different anode-cathode materials: A simple approach

    DEFF Research Database (Denmark)

    Henrichsen, Henrik Hartmann; Sturm, Heinz; Bøggild, Peter

    2010-01-01

    The authors present a simple general method for simultaneously producing tens of submicron electrode gaps with different cathode and anode materials on top of nanofibers, nanowires, and nanotubes, with an optional gap size variation. Using this method, an ensemble of para-hexaphenylene (p6P...

  3. Cleaning aspects of material choice for high end mask manufacturing

    Science.gov (United States)

    Nesladek, Pavel; Osborne, Steve; Rümmelin, Stefan

    2012-02-01

    After decades of binary mask manufacturing using Cr absorber the material spectrum was extended by phase shift material in late 90's during introduction of Half Tone Phase Shift Masks (HT-PSM). This change had strong impact on manufacturing flow as well as several unit processes. A consequences of phase shifter introduction was the necessity of introducing a second level litho process, as well as introducing of dry etch processes due to poor etch properties of MoSi using wet chemistry. Less obvious and rather unremarkable was the impact of this change to clean processes, except the impact of the clean process on the phase shift. In recent years we've seen several new materials based on varying chemical composition as well as thickness of the absorber developed by various mask blank vendors namely Hoya and ShinEtsu. These materials are improving resolution, pattern fidelity and to some degree also mask lifetime. Adding the EUV mask blank materials increases further the spectrum of materials, taking into account all the absorber stacks available today on market. Thorough investigation of the clean process performance as a function of surface material shows significant variation in the critical parameters as defectivity, susceptibility to recontamination and relative cleaning efficiency. Goal of this work is to 1) Compare the already mentioned clean related properties together with feature damage and impact on the critical dimension (CD) shift for different materials. 2) Find a compromise between the technology requirements and process limitations resulting from the combination of available processes with material properties. Some aspects of the new materials such as stack height and interface between absorber and substrate are making this task easier, especially with respect to feature damage. On the other hand the most critical parameter - the cleaning efficiency, dropped due to the introduction of the new materials, mainly due to unfavorable sticking coefficients

  4. Energy enhancer for mask based laser materials processing

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1996-01-01

    A device capable of drastically improving the energy efficiency of present mask based laser materials processing systems is presented. Good accordance between experiments and simulations for a TEA-CO2 laser system designed for laser marking has been demonstrated. The energy efficiency may...

  5. Contrast ratio and masking ability of three ceramic veneering materials.

    Science.gov (United States)

    Shono, N N; Al Nahedh, H N A

    2012-01-01

    Porcelain veneer materials are translucent and are therefore affected by their thickness as well as the color of the underlying substructure, which limits their masking ability and compromises the esthetic result in heavily stained teeth. The purpose of this study was to compare the contrast ratio (CR) and masking ability of three different veneering ceramics with two thicknesses by measuring the color differences over white and black backgrounds. Correlations between CR and masking ability of these veneering ceramics were evaluated. A total of 30 disc-shaped specimens (12 mm diameter × 1.0 mm or 1.5 mm) were fabricated in shade A2 from three types of all-ceramic systems: IPS e.max Press (IPSe; Ivoclar Vivadent, Schaan, Liechtensein), Vita VM7 (VM7; VITA Zahnfabrik, Bad Säckingen, Germany), and Nobel Rondo Press Alumina: Solo (NRPA; Nobel Biocare, Zürich-Flughafen, Switzerland). The CR, defined as the ratio of illuminance (Y) of the test material when placed on the black background (Yb) to the illuminance of the same material when placed over a white background (Yw), was determined (CR=Yb/Yw). The color (CIE L*a*b*) and Y of each specimen were measured over standard white and black tiles using a spectrophotometer (ColorEye 7000 A, Model C6, GretagMacbeth, New Windsor, NY, USA). Masking abilities of the specimens were determined by measuring the color difference (ΔE) over white and black backgrounds. Both CR and ΔE data were analyzed using two-way analysis of variance (ANOVA). One-way ANOVA was used to compare the mean values of CR across the three materials followed by the Duncan multiple comparison test. The correlations between CR and ΔE were determined by comparing R(2) values obtained from a linear regression analysis. A Student t-test for independent samples was used to compare the mean contrast ratio and ΔE values for the two thicknesses. CR values of NRPA were significantly less than those of IPSe and VM7, and the CR of IPSe was higher than that of VM

  6. Scalable Sub-micron Patterning of Organic Materials Toward High Density Soft Electronics.

    Science.gov (United States)

    Kim, Jaekyun; Kim, Myung-Gil; Kim, Jaehyun; Jo, Sangho; Kang, Jingu; Jo, Jeong-Wan; Lee, Woobin; Hwang, Chahwan; Moon, Juhyuk; Yang, Lin; Kim, Yun-Hi; Noh, Yong-Young; Jaung, Jae Yun; Kim, Yong-Hoon; Park, Sung Kyu

    2015-09-28

    The success of silicon based high density integrated circuits ignited explosive expansion of microelectronics. Although the inorganic semiconductors have shown superior carrier mobilities for conventional high speed switching devices, the emergence of unconventional applications, such as flexible electronics, highly sensitive photosensors, large area sensor array, and tailored optoelectronics, brought intensive research on next generation electronic materials. The rationally designed multifunctional soft electronic materials, organic and carbon-based semiconductors, are demonstrated with low-cost solution process, exceptional mechanical stability, and on-demand optoelectronic properties. Unfortunately, the industrial implementation of the soft electronic materials has been hindered due to lack of scalable fine-patterning methods. In this report, we demonstrated facile general route for high throughput sub-micron patterning of soft materials, using spatially selective deep-ultraviolet irradiation. For organic and carbon-based materials, the highly energetic photons (e.g. deep-ultraviolet rays) enable direct photo-conversion from conducting/semiconducting to insulating state through molecular dissociation and disordering with spatial resolution down to a sub-μm-scale. The successful demonstration of organic semiconductor circuitry promise our result proliferate industrial adoption of soft materials for next generation electronics.

  7. Large-scale self-assembly of uniform submicron silver sulfide material driven by precise pressure control

    Science.gov (United States)

    Qi, Juanjuan; Chen, Ke; Zhang, Shuhao; Yang, Yun; Guo, Lin; Yang, Shihe

    2017-03-01

    The controllable self-assembly of nanosized building blocks into larger specific structures can provide an efficient method of synthesizing novel materials with excellent properties. The self-assembly of nanocrystals by assisted means is becoming an extremely active area of research, because it provides a method of producing large-scale advanced functional materials with potential applications in the areas of energy, electronics, optics, and biologics. In this study, we applied an efficient strategy, namely, the use of ‘pressure control’ to the assembly of silver sulfide (Ag2S) nanospheres with a diameter of approximately 33 nm into large-scale, uniform Ag2S sub-microspheres with a size of about 0.33 μm. More importantly, this strategy realizes the online control of the overall reaction system, including the pressure, reaction time, and temperature, and could also be used to easily fabricate other functional materials on an industrial scale. Moreover, the thermodynamics and kinetics parameters for the thermal decomposition of silver diethyldithiocarbamate (Ag(DDTC)) are also investigated to explore the formation mechanism of the Ag2S nanosized building blocks which can be assembled into uniform sub-micron scale architecture. As a method of producing sub-micron Ag2S particles by means of the pressure-controlled self-assembly of nanoparticles, we foresee this strategy being an efficient and universally applicable option for constructing other new building blocks and assembling novel and large functional micromaterials on an industrial scale.

  8. The potentiality of leather as alternative material for sustaining mask ...

    African Journals Online (AJOL)

    This study explored the viability of the Ghanaian indigenous vegetable tanned leather for the production of aesthetic masks for ornamental purposes. The study was basically experimental, and all processes were observed and recorded carefully for analysis. Modeling technique was principally used in three experiments to ...

  9. Facile synthesis and stable cycling ability of hollow submicron silicon oxide–carbon composite anode material for Li-ion battery

    Energy Technology Data Exchange (ETDEWEB)

    Kim, Joong-Yeon; Nguyen, Dan Thien [Department of Fine Chemical Engineering & Applied Chemistry, Chungnam National University, Daejeon 305-764 (Korea, Republic of); Kang, Joon-Sup [Department of Energy Science and Technology, Chungnam National University, Daejeon 305-764 (Korea, Republic of); Song, Seung-Wan, E-mail: swsong@cnu.ac.kr [Department of Fine Chemical Engineering & Applied Chemistry, Chungnam National University, Daejeon 305-764 (Korea, Republic of); Department of Energy Science and Technology, Chungnam National University, Daejeon 305-764 (Korea, Republic of)

    2015-06-05

    Highlights: • Hollow submicron SiO{sub 2}–carbon composite material was synthesized using Si{sup 4+}-citrate chelation. • Composite material possessed a homogeneous distribution of SiO{sub 2} and carbon. • Composite electrode delivered ⩾600 mAh/g with a stable cycling stability. • This materials design and synthesis provides a useful platform for scalable production. - Abstract: Advanced SiO{sub 2}–carbon composite anode active material for lithium-ion battery has been synthesized through a simple chelation of silicon cation with citrate in a glyme-based solvent. The resultant composite material demonstrates a homogeneous distribution of constituents over the submicron particles and a unique hollow spherical microstructure, which provides an enhanced electrical conductivity and better accommodation of volume change of silicon during electrochemical charge–discharge cycling, respectively. As a result, the composite electrode exhibits a high cycling stability delivering the capacity retention of 91% at the 100th cycle and discharge capacities of 662–602 mAh/g and coulombic efficiencies of 99.8%. This material synthesis is scalable and cost-effective in preparing various submicron or micron composite electrode materials.

  10. Application of charge-dissipation material in MEBES phase-shift mask fabrication

    Science.gov (United States)

    Tan, Zoilo C. H.; Sauer, Charles A.

    1994-12-01

    Several charge dissipation materials were evaluated for their ability to improve the overlay accuracy during phase shift mask (PSM) registered writing on a MEBES system. These included an organic conductive polymer and a number of thin inorganic films, which were applied above or below the resist on a coated mask. When used with the resists, all conductive materials evaluated were capable of providing adequate charge dissipation during registered writing. Overlay accuracy of mean + 3 sigma

  11. Investigation of moisture uptake into printed circuit board laminate and solder mask materials

    DEFF Research Database (Denmark)

    Conseil, Helene; Gudla, Visweswara Chakravarthy; Borgaonkar, Shruti

    2017-01-01

    with different solder mask materials and exposed to saturated water vapour and liquid water. The solder masks are characterised for their microstructure and constituent phases using scanning electron microscopy and X-ray diffraction. The observations are correlated with themoisture absorption characteristic...... such as diffusivity, permeability, and solubility. In addition, the effect of a reflow soldering simulation on microstructural changes and onincrease of water uptake of the materials has been analysed......Presence of moisture in a printed circuit board (PCB) laminate, typically made of glass fibres reinforced epoxy polymer, significantly influences the electrical functionality in various ways and causes problems during soldering process. This paper investigates the water uptake of laminates coated...

  12. Evaluation of commercial and experimental resist materials for use in MEBES mask making

    Science.gov (United States)

    Sauer, Charles A.; Dean, Robert L.; Morita, Etsuya; Tan, Zoilo C. H.; Smith, Bruce W.; Ewbank, Dale E.; Duttagupta, Sid P.; Rudack, Anne

    1995-12-01

    The SIA roadmap has identified CD control as a critical issue in mask making. PBS, the most popular resist used for electron-beam mask making in the U.S., may not perform at the level required for production of 250 nm devices. There is a need in the industry today for precise CD control and tight control of CD uniformity, as well as a desire to dry etch thin films on masks. These industry trends make the use of an alternative resist attractive. A project was initiated to determine if an acceptable substitute to PBS exists. A group of eleven negative and positive resists were examined. These included chemically amplified materials, two part- novolacs, and a silicon-containing resist, among others. The resists were evaluated by using design of experiments (DOE) methodology whenever possible. All masks were exposed on 10 kV MEBES writing tools. The results were tabulated and compared, using a SEMATECH criterion for acceptability. Results are presented, including optimization of some of the materials for sensitivity, process robustness, and dry etch capability. While none of the materials met all criteria, several resists performed at a level that make them candidates to replace PBS. Several options are presented that are of interest to the mask maker contemplating process changes to accommodate 250 nm and 180 nm technologies.

  13. High Efficiency Mask Based Laser Materials Processing with TEA-CO2 - and Excimer Laser

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1997-01-01

    In general, mask based laser materials processing techniques suffer from a very low energy efficiency. We have developed a simple device called an energy enhancer, which is capable of increasing the energy efficiency of typical mask based laser materials processing systems. A short review of the ...... line marking with TEA-CO2 laser of high speed canning lines. The second one is manufactured for marking or microdrilling with excimer laser.......In general, mask based laser materials processing techniques suffer from a very low energy efficiency. We have developed a simple device called an energy enhancer, which is capable of increasing the energy efficiency of typical mask based laser materials processing systems. A short review...... of the most widely used applications of these systems is given and the potential advantages of the energy enhancer are discussed.The basic principle behind the energy enhancing technique is explained and two new energy enhancers are presented and evaluated. The first one is designed especially for single text...

  14. Submicron structure random field on granular soil material with retinex algorithm optimization

    OpenAIRE

    Liang Yu; Tao Chenyuan; Zhou Bingcheng; Huang Shuai; Huang Linchong

    2017-01-01

    In this paper, a Retinex scale optimized image enhancement algorithm is proposed, which can enhance the micro vision image and eliminate the influence of the uneven illumination. Based on that, a random geometric model of the microstructure of granular materials is established with Monte-Carlo method, the numerical simulation including consolidation process of granular materials is compared with the experimental data. The results have proved that the random field method with Retinex image enh...

  15. Submicron structure random field on granular soil material with retinex algorithm optimization

    Science.gov (United States)

    Liang, Yu; Tao, Chenyuan; Zhou, Bingcheng; Huang, Shuai; Huang, Linchong

    2017-06-01

    In this paper, a Retinex scale optimized image enhancement algorithm is proposed, which can enhance the micro vision image and eliminate the influence of the uneven illumination. Based on that, a random geometric model of the microstructure of granular materials is established with Monte-Carlo method, the numerical simulation including consolidation process of granular materials is compared with the experimental data. The results have proved that the random field method with Retinex image enhancement algorithm is effective, the image of microstructure of granular materials becomes clear and the contrast ratio is improved, after using Retinex image enhancement algorithm to enhance the CT image. The fidelity of enhanced image is higher than that dealing with other method, which have explained that the algorithm can preserve the microstructure information of the image well. The result of numerical simulation is similar with the one obtained from conventional three axis consolidation test, which proves that the simulation result is reliable.

  16. Submicron structure random field on granular soil material with retinex algorithm optimization

    Directory of Open Access Journals (Sweden)

    Liang Yu

    2017-01-01

    Full Text Available In this paper, a Retinex scale optimized image enhancement algorithm is proposed, which can enhance the micro vision image and eliminate the influence of the uneven illumination. Based on that, a random geometric model of the microstructure of granular materials is established with Monte-Carlo method, the numerical simulation including consolidation process of granular materials is compared with the experimental data. The results have proved that the random field method with Retinex image enhancement algorithm is effective, the image of microstructure of granular materials becomes clear and the contrast ratio is improved, after using Retinex image enhancement algorithm to enhance the CT image. The fidelity of enhanced image is higher than that dealing with other method, which have explained that the algorithm can preserve the microstructure information of the image well. The result of numerical simulation is similar with the one obtained from conventional three axis consolidation test, which proves that the simulation result is reliable.

  17. Modeling of intense pulsed ion beam heated masked targets for extreme materials characterization

    Science.gov (United States)

    Barnard, John J.; Schenkel, Thomas

    2017-11-01

    Intense, pulsed ion beams locally heat materials and deliver dense electronic excitations that can induce material modifications and phase transitions. Material properties can potentially be stabilized by rapid quenching. Pulsed ion beams with pulse lengths of order ns have recently become available for materials processing. Here, we optimize mask geometries for local modification of materials by intense ion pulses. The goal is to rapidly excite targets volumetrically to the point where a phase transition or local lattice reconstruction is induced followed by rapid cooling that stabilizes desired material's properties fast enough before the target is altered or damaged by, e.g., hydrodynamic expansion. By using a mask, the longitudinal dimension can be large compared to the transverse dimension, allowing the possibility of rapid transverse cooling. We performed HYDRA simulations that calculate peak temperatures for a series of excitation conditions and cooling rates of silicon targets with micro-structured masks and compare these to a simple analytical model. The model gives scaling laws that can guide the design of targets over a wide range of pulsed ion beam parameters.

  18. TOPICAL REVIEW: Fabrication of micro- and nano-structured materials using mask-less processes

    Science.gov (United States)

    Roy, Sudipta

    2007-11-01

    Micro- and nano-scale devices are used in electronics, micro-electro- mechanical, bio-analytical and medical components. An essential step for the fabrication of such small scale devices is photolithography. Photolithography requires a master mask to transfer micrometre or sub-micrometre scale patterns onto a substrate. The requirement of a physical, rigid mask can impede progress in applications which require rapid prototyping, flexible substrates, multiple alignment and 3D fabrication. Alternative technologies, which do not require the use of a physical mask, are suitable for these applications. In this paper mask-less methods of micro- and nano-scale fabrication have been discussed. The most common technique, which is the laser direct imaging (LDI), technique has been applied to fabricate micrometre scale structures on printed circuit boards, glass and epoxy. LDI can be combined with chemical methods to deposit metals, inorganic materials as well as some organic entities at the micrometre scale. Inkjet technology can be used to fabricate micrometre patterns of etch resists, organic transistors as well as arrays for bioanalysis. Electrohydrodynamic atomisation is used to fabricate micrometre scale ceramic features. Electrochemical methodologies offer a variety of technical solutions for micro- and nano-fabrication owing to the fact that electron charge transfer can be constrained to a solid liquid interface. Electrochemical printing is an adaptation of inkjet printing which can be used for rapid prototyping of metallic circuits. Micro-machining using nano-second voltage pulses have been used to fabricate high precision features on metals and semiconductors. Optimisation of reactor, electrochemistry and fluid flow (EnFACE) has also been employed to transfer micrometre scale patterns on a copper substrate. Nano-scale features have been fabricated by using specialised tools such as scanning tunnelling microscopy, atomic force microscopy and focused ion beam. The

  19. Hybrid mask for deep etching

    KAUST Repository

    Ghoneim, Mohamed T.

    2017-08-10

    Deep reactive ion etching is essential for creating high aspect ratio micro-structures for microelectromechanical systems, sensors and actuators, and emerging flexible electronics. A novel hybrid dual soft/hard mask bilayer may be deposited during semiconductor manufacturing for deep reactive etches. Such a manufacturing process may include depositing a first mask material on a substrate; depositing a second mask material on the first mask material; depositing a third mask material on the second mask material; patterning the third mask material with a pattern corresponding to one or more trenches for transfer to the substrate; transferring the pattern from the third mask material to the second mask material; transferring the pattern from the second mask material to the first mask material; and/or transferring the pattern from the first mask material to the substrate.

  20. Adhesive Systems as an Alternative Material for Color Masking of White Spot Lesions: Do They Work?

    Science.gov (United States)

    de Lacerda, Ana Júlia Farias; da Silva Ávila, Daniele Mara; Borges, Alessandra Buhler; Pucci, Cesar Rogerio; Rocha Gomes Torres, Carlos

    2016-01-01

    To evaluate the color masking effect of infiltration treatment of artificial white spot lesions (AWSL) using a dedicated resin in comparison to different adhesive systems. Enamel/dentin specimens were obtained from bovine incisors and baseline color was assessed using a reflectance spectrophotometer, according to the CIE L*a*b* system. AWSL were produced using a buffered acid solution and a new color evaluation was performed. The specimens were divided into 8 groups: control: artificial saliva changed daily for 7 days; IC: infiltrating resin Icon; EC: EquiaCoat; FU: Futurabond U; SBU: Single Bond U; SBMP: Scotchbond MP; OB: OptibondFL; BF: Bioforty. After the treatments, the color was evaluated again and the values for the parameters ΔL (change in lightness), Δa (change in chroma), Δb (change in hue), and ΔE (general color difference) were calculated in relation to baseline. Data were analyzed by one-way ANOVA and Tukey's tests. After treatment, ANOVA showed significant differences for all parameters (p = 0.001). Tukey's test showed the greatest lightness reduction (ΔL) for the IC group, followed by EC, FU, and SBU. The SBMP, OB, and BF groups were similar to the control. For Δb values, all groups showed differences in relation to the control, with no differences between them. In relation to ΔE, all groups showed differences in relation to the control (ΔE = 5.24), with no significant differences between them. ΔE values after application of all resinous materials were lower than the threshold of 3.7, indicating effective color masking. The Icon infiltrant produced a greater lightness reduction of white lesions (ΔL). For general color difference (ΔE), all the resinous materials tested were able to color mask artificial AWSL.

  1. Pulmonary clearance kinetics and extrapulmonary translocation of seven titanium dioxide nano- and submicron materials following intratracheal administration in rats.

    Science.gov (United States)

    Shinohara, Naohide; Oshima, Yutaka; Kobayashi, Toshio; Imatanaka, Nobuya; Nakai, Makoto; Ichinose, Takayuki; Sasaki, Takeshi; Kawaguchi, Kenji; Zhang, Guihua; Gamo, Masashi

    2015-01-01

    We evaluated and compared the pulmonary clearance kinetics and extrapulmonary translocations of seven titanium dioxide (TiO2) nano- and submicron particles with different characteristics, including size, shape and surface coating. Varying doses of TiO2 nano- and submicron particles dispersed in 0.2% disodium phosphate solution were intratracheally administered to male F344 rats. The rats were euthanized under anesthesia for 3, 28 and 91 days after administration. Ti levels in pulmonary and various extrapulmonary organs were determined using inductively coupled plasma-sector field mass spectrometry (ICP-SFMS). The lungs, including bronchoalveolar lavage fluid (BALF), contained 55-89% of the administered TiO2 dose at 3 days after administration. The pulmonary clearance rate constants, estimated using a one-compartment model, were higher after administration of 0.375-2.0 mg/kg body weight (bw) (0.016-0.020/day) than after administration of 3.0-6.0 mg/kg bw (0.0073-0.013/day) for six uncoated TiO2. In contrast, the clearance rate constant was 0.011, 0.0046 and 0.00018/day following administration of 0.67, 2.0 and 6.0 mg/kg bw TiO2 nanoparticle with Al(OH)3 coating, respectively. Translocation of TiO2 from the lungs to the thoracic lymph nodes increased in a time- and dose-dependent manner. Furthermore, the translocation of TiO2 from the lungs to the thoracic lymph nodes after 91 days was higher when Al(OH)3 coated TiO2 was administered (0.93-6.4%), as compared to uncoated TiO2 (0.016-1.8%). Slight liver translocation was observed (kidney, spleen and brain.

  2. Light emitting diode with high aspect ratio submicron roughness for light extraction and methods of forming

    Science.gov (United States)

    Li, Ting [Ventura, CA

    2011-04-26

    The surface morphology of an LED light emitting surface is changed by applying a reactive ion etch (RIE) process to the light emitting surface. High aspect ratio, submicron roughness is formed on the light emitting surface by transferring a thin film metal hard-mask having submicron patterns to the surface prior to applying a reactive ion etch process. The submicron patterns in the metal hard-mask can be formed using a low cost, commercially available nano-patterned template which is transferred to the surface with the mask. After subsequently binding the mask to the surface, the template is removed and the RIE process is applied for time duration sufficient to change the morphology of the surface. The modified surface contains non-symmetric, submicron structures having high aspect ratio which increase the efficiency of the device.

  3. Light emitting diode with high aspect ratio submicron roughness for light extraction and methods of forming

    Science.gov (United States)

    Li, Ting

    2013-08-13

    The surface morphology of an LED light emitting surface is changed by applying a reactive ion etch (RIE) process to the light emitting surface. High aspect ratio, submicron roughness is formed on the light emitting surface by transferring a thin film metal hard-mask having submicron patterns to the surface prior to applying a reactive ion etch process. The submicron patterns in the metal hard-mask can be formed using a low cost, commercially available nano-patterned template which is transferred to the surface with the mask. After subsequently binding the mask to the surface, the template is removed and the RIE process is applied for time duration sufficient to change the morphology of the surface. The modified surface contains non-symmetric, submicron structures having high aspect ratio which increase the efficiency of the device.

  4. Rapid and direct micro-machining/patterning of polymer materials by oxygen MeV ion beam irradiation through masks

    Energy Technology Data Exchange (ETDEWEB)

    Brun, S., E-mail: sebastien.brun@he-arc.ch [Institut des Microtechnologies Appliquees, Eplatures-Grise 17, 2300 La Chaux-de-Fonds (Switzerland); Guibert, G. [Institut des Microtechnologies Appliquees, Eplatures-Grise 17, 2300 La Chaux-de-Fonds (Switzerland); Meunier, C. [Universite de Franche Comte, Institut FEMTO-ST, UMR 6174 CNRS, 4 Place Tharradin, BP 71427, 25211 Montbeliard (France); Guibert, E.; Keppner, H.; Mikhailov, S. [Institut des Microtechnologies Appliquees, Eplatures-Grise 17, 2300 La Chaux-de-Fonds (Switzerland)

    2011-10-15

    PTFE (PolyTetraFluoroEthylene), often called Teflon, is a well-known polymer for being a non-stick material with good thermal properties. Moreover, PTFE is biocompatible and especially it is a cyto-compatible polymer. To enable bonding, a chemical etching based on sodium solutions is generally used to modify surfaces. In this paper we study the etching of PTFE using an oxygen ion beam in the MeV energy range. We present micro-patterning of PTFE through masks with two fluences of 5 x 10{sup 15} and 1 x 10{sup 16} ion cm{sup -2}. As is demonstrated the use of a mask allows structuring of large areas while maintaining a distance between the mask and sample makes industrial applications possible.

  5. Flash thermography with a periodic mask: profile evaluation of the principal diffusivities for the control of composite materials

    Science.gov (United States)

    Spagnolo, Leonardo; Krapez, Jean-Claude; Friess, Martin; Maier, Hans-Peter; Neuer, Guenther

    2003-04-01

    Recently we proposed a modification of the classical flash thermography method for diffusivity measurement: by putting a mask having a periodic pattern of apertures between the flash lamp and the orthotropic material to be tested, one can obtain simultaneously the out-of-plane diffusivity and the in-plane diffusivity of the material. Here we present two examples where the measurement of the thermal properties is made at a local level: the experiment is performed with a large grid mask, however the parameter identification is made on a sliding window whose width corresponds to one-period of the mask. By this way, one can get a profile for each diffusivity. By applying this procedure, one can expect detecting localised variations of the thermal properties, as well as cracks. We controlled by this way a series of C/C-SiC dog-bone samples during a tensile test. We systematically observed a rather uniform and linear decrease of about 0.1%/MPa for the in-plane diffusivity. This behaviour is related with the fact that a stress increase induces a gradual increase of the microcracks density. The second example deals with carbon disk brakes control. By using a circular mask, one can get in about two minutes the circumferential profile of both in-plane and out of plane diffusivities of the composite piece.

  6. Effect of facial material softness and applied force on face mask dead volume, face mask seal, and inhaled corticosteroid delivery through an idealized infant replica.

    Science.gov (United States)

    Carrigy, Nicholas B; O'Reilly, Connor; Schmitt, James; Noga, Michelle; Finlay, Warren H

    2014-08-01

    During the aerosol delivery device design and optimization process, in vitro lung dose (LD) measurements are often performed using soft face models, which may provide a more clinically relevant representation of face mask dead volume (MDV) and face mask seal (FMS) than hard face models. However, a comparison of MDV, FMS, and LD for hard and soft face models is lacking. Metal, silicone, and polyurethane represented hard, soft, and very soft facial materials, respectively. MDV was measured using a water displacement technique. FMS was measured using a valved holding chamber (VHC) flow rate technique. The LD of beclomethasone dipropionate (BDP) delivered via a 100-μg Qvar® pressurized metered dose inhaler with AeroChamber Plus® Flow-Vu® VHC and Small Mask, defined as that which passes through the nasal airways of the idealized infant geometry, was measured using a bias tidal flow system with a filter. MDV, FMS, and LD were measured at 1.5 lb and 3.5 lb of applied force. A mathematical model was used to predict LD based on experimental measurements of MDV and FMS. Experimental BDP LD measurements for ABS, silicone, and polyurethane at 1.5 lb were 0.9 (0.6) μg, 2.4 (1.9) μg, and 19.3 (0.9) μg, respectively. At 3.5 lb, the respective LD was 10.0 (1.5) μg, 13.8 (1.4) μg, and 14.2 (0.9) μg. Parametric analysis with the mathematical model showed that differences in FMS between face models had a greater impact on LD than differences in MDV. The use of soft face models resulted in higher LD than hard face models, with a greater difference at 1.5 lb than at 3.5 lb. A lack of a FMS led to decreased dose consistency; therefore, a sealant should be used when measuring LD with a hard ABS or soft silicone face model at 1.5 lb of applied force or less.

  7. Submicron and Nanoparticulate Matter Removal by HEPA-Rated Media Filters and Packed Beds of Granular Materials

    Science.gov (United States)

    Perry, J. L.; Agui, J. H.; Vijayakimar, R

    2016-01-01

    Contaminants generated aboard crewed spacecraft by diverse sources consist of both gaseous chemical contaminants and particulate matter. Both HEPA media filters and packed beds of granular material, such as activated carbon, which are both commonly employed for cabin atmosphere purification purposes have efficacy for removing nanoparticulate contaminants from the cabin atmosphere. The phenomena associated with particulate matter removal by HEPA media filters and packed beds of granular material are reviewed relative to their efficacy for removing fine (less than 2.5 micrometers) and ultrafine (less than 0.01 micrometers) sized particulate matter. Considerations are discussed for using these methods in an appropriate configuration to provide the most effective performance for a broad range of particle sizes including nanoparticulates.

  8. Efficiency of five chemical protective clothing materials against nano and submicron aerosols when submitted to mechanical deformations.

    Science.gov (United States)

    Ben Salah, Mehdi; Hallé, Stéphane; Tuduri, Ludovic

    2016-01-01

    Due to their potential toxicity, the use of nanoparticles in the workplace is a growing concern. Some studies indicate that nanoparticles can penetrate the skin and lead to adverse health effects. Since chemical protective clothing is the last barrier to protect the skin, this study aims to better understand nanoparticle penetration behaviour in dermal protective clothing under mechanical deformation. For this purpose, five of the most common types of fabrics used in protective clothing, one woven and four nonwoven, were chosen and submitted to different simulated exposure conditions. They were tested against polydispersed NaCl aerosols having an electrical-mobility diameter between 14 and 400 nm. A bench-scale exposure setup and a sampling protocol was developed to measure the level of penetration of the aerosols through the material samples of disposable coveralls and lab coat, while subjecting them to mechanical deformations to simulate the conditions of usage in the workplace. Particle size distribution of the aerosol was determined upstream and downstream using a scanning mobility particle sizer (SMPS). The measured efficiencies demonstrated that the performances of nonwoven materials were similar. Three nonwovens had efficiencies above 99%, while the woven fabric was by far, the least effective. Moreover, the results established that mechanical deformations, as simulated for this study, did not have a significant effect on the fabrics' efficiencies.

  9. Tailored synthesis of monodispersed nano/submicron porous silicon oxycarbide (SiOC) spheres with improved Li-storage performance as an anode material for Li-ion batteries

    Science.gov (United States)

    Shi, Huimin; Yuan, Anbao; Xu, Jiaqiang

    2017-10-01

    A spherical silicon oxycarbide (SiOC) material (monodispersed nano/submicron porous SiOC spheres) is successfully synthesized via a specially designed synthetic strategy involving pyrolysis of phenyltriethoxysilane derived pre-ceramic polymer spheres at 900 °C. In order to prevent sintering of the pre-ceramic polymer spheres upon heating, a given amount of hollow porous SiO2 nanobelts which are separately prepared from tetraethyl orthosilicate with CuO nanobelts as templates are introduced into the pre-ceramic polymer spheres before pyrolysis. This material is investigated as an anode for lithium-ion batteries in comparison with the large-size bulk SiOC material synthesized under the similar conditions but without hollow SiO2 nanobelts. The maximum reversible specific capacity of ca. 900 mAh g-1 is delivered at the current density of 100 mA g-1 and ca. 98% of the initial capacity is remained after 100 cycles at 100 mA g-1 for the SiOC spheres material, which are much superior to the bulk SiOC material. The improved lithium storage performance in terms of specific capacity and cyclability is attributed to its particular morphology of monodisperse nano/submicron porous spheres as well as its modified composition and microstructure. This SiOC material has higher Li-storage activity and better stability against volume expansion during repeated lithiation and delithiation cycling.

  10. Prototype of an energy enhancer for mask based laser materials processing

    DEFF Research Database (Denmark)

    Bastue, Jens; Olsen, Flemmming Ove

    1997-01-01

    by a factor of 2 - 4 for a typical TEA-CO2 system for mask based laser marking. A simple ray-tracing model has been built in order to design and optimise the energy enhancer. Thus we present experimental results as well as simulations and show fine accordance between the two. Important system parameters like...... component reflectivity and alignment sensitivity are investigated in order to evaluate the possibility of making commercial use of the device. The obtainable image quality and how this is influenced by the focusing and imaging system is discussed in some detail....

  11. Honeycomb core material for sandwich construction - with common hexagonal walls bonded by thermoplastic resin and free walls carrying layer of resin and masking agent

    NARCIS (Netherlands)

    Undetermined, U.

    1991-01-01

    Abstract of NL 8902116 (A) In a honeycomb core material for a sandwich construction, the common hexagonal walls are bonded together by a thermoplastic resin, and the free hexagonal walls carry a layer of the same resin and also a masking agent. - A number of plates of raw material are given strips

  12. Fabrication of a Polymer Micro Needle Array by Mask-Dragging X-Ray Lithography and Alignment X-Ray Lithography

    Science.gov (United States)

    Li, Yi-Gui; Yang, Chun-Sheng; Liu, Jing-Quan; Sugiyama, Susumu

    2011-03-01

    Polymer materials such as transparent thermoplastic poly(methyl methacrylate) (PMMA) have been of great interest in the research and development of integrated circuits and micro-electromechanical systems due to their relatively low cost and easy process. We fabricated PMMA-based polymer hollow microneedle arrays by mask-dragging and aligning x-ray lithography. Techniques for 3D micromachining by direct lithography using x-rays are developed. These techniques are based on using image projection in which the x-ray is used to illuminate an appropriate gold pattern on a polyimide film mask. The mask is imaged onto the PMMA sample. A pattern with an area of up to 100 × 100mm2 can be fabricated with sub-micron resolution and a highly accurate order of a few microns by using a dragging mask. The fabrication technology has several advantages, such as forming complex 3D micro structures, high throughput and low cost.

  13. Bringing mask repair to the next level

    Science.gov (United States)

    Edinger, K.; Wolff, K.; Steigerwald, H.; Auth, N.; Spies, P.; Oster, J.; Schneider, H.; Budach, M.; Hofmann, T.; Waiblinger, M.

    2014-10-01

    Mask repair is an essential step in the mask manufacturing process as the extension of 193nm technology and the insertion of EUV are drivers for mask complexity and cost. The ability to repair all types of defects on all mask blank materials is crucial for the economic success of a mask shop operation. In the future mask repair is facing several challenges. The mask minimum features sizes are shrinking and require a higher resolution repair tool. At the same time mask blanks with different new mask materials are introduced to optimize optical performance and long term durability. For EUV masks new classes of defects like multilayer and phase defects are entering the stage. In order to achieve a high yield, mask repair has to cover etch and deposition capabilities and must not damage the mask. These challenges require sophisticated technologies to bring mask repair to the next level. For high end masks ion-beam based and e-based repair technologies are the obvious choice when it comes to the repair of small features. Both technologies have their pro and cons. The scope of this paper is to review and compare the performance of ion-beam based mask repair to e-beam based mask repair. We will analyze the limits of both technologies theoretically and experimentally and show mask repair related performance data. Based on this data, we will give an outlook to future mask repair tools.

  14. Combined laser and atomic force microscope lithography on aluminum: Mask fabrication for nanoelectromechanical systems

    DEFF Research Database (Denmark)

    Berini, Abadal Gabriel; Boisen, Anja; Davis, Zachary James

    1999-01-01

    A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production of nanoelectromecha......A direct-write laser system and an atomic force microscope (AFM) are combined to modify thin layers of aluminum on an oxidized silicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production...

  15. Submicron particles of Co, Ni and Co–Ni alloys

    Indian Academy of Sciences (India)

    Home; Journals; Bulletin of Materials Science; Volume 24; Issue 5 ... Magnetic Materials Volume 24 Issue 5 October 2001 pp 515-521 ... Magnetic sub-micron sized particles (with diameters in the range 100–600 nm) of Co, Ni and Co–Ni alloys, protected with polyvinylpyrrolidone have been prepared in gram quantities ...

  16. NATO Advanced Study Institute on Physics of Submicron Semiconductor Devices

    CERN Document Server

    Ferry, David; Jacoboni, C

    1988-01-01

    The papers contained in the volume represent lectures delivered as a 1983 NATO ASI, held at Urbino, Italy. The lecture series was designed to identify the key submicron and ultrasubmicron device physics, transport, materials and contact issues. Nonequilibrium transport, quantum transport, interfacial and size constraints issues were also highlighted. The ASI was supported by NATO and the European Research Office. H. L. Grubin D. K. Ferry C. Jacoboni v CONTENTS MODELLING OF SUB-MICRON DEVICES.................. .......... 1 E. Constant BOLTZMANN TRANSPORT EQUATION... ... ...... .................... 33 K. Hess TRANSPORT AND MATERIAL CONSIDERATIONS FOR SUBMICRON DEVICES. . .. . . . . .. . . . .. . .. . .... ... .. . . . .. . . . .. . . . . . . . . . . 45 H. L. Grubin EPITAXIAL GROWTH FOR SUB MICRON STRUCTURES.................. 179 C. E. C. Wood INSULATOR/SEMICONDUCTOR INTERFACES.......................... 195 C. W. Wilms en THEORY OF THE ELECTRONIC STRUCTURE OF SEMICONDUCTOR SURFACES AND INTERFACES...................

  17. Magnetic and Optical Properties of Submicron-Size Hollow Spheres

    Directory of Open Access Journals (Sweden)

    Hirofumi Yoshikawa

    2010-02-01

    Full Text Available Magnetic hollow spheres with a controlled diameter and shell thickness have emerged as an important class of magnetic nanomaterials. The confined hollow geometry and pronouncedly curved surfaces induce unique physical properties different from those of flat thin films and solid counterparts. In this paper, we focus on recent progress on submicron-size spherical hollow magnets (e.g., cobalt- and iron-based materials, and discuss the effects of the hollow shape and the submicron size on magnetic and optical properties.

  18. Clay Mask Workshop

    Science.gov (United States)

    Gamble, David L.

    2012-01-01

    Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

  19. The Materials Chemistry of Atomic Oxygen with Applications to Anisotropic Etching of Submicron Structures in Microelectronics and the Surface Chemistry Engineering of Porous Solids

    Science.gov (United States)

    Koontz, Steve L.; Leger, Lubert J.; Wu, Corina; Cross, Jon B.; Jurgensen, Charles W.

    1994-01-01

    Neutral atomic oxygen is the most abundant component of the ionospheric plasma in the low Earth orbit environment (LEO; 200 to 700 kilometers altitude) and can produce significant degradation of some spacecraft materials. In order to produce a more complete understanding of the materials chemistry of atomic oxygen, the chemistry and physics of O-atom interactions with materials were determined in three radically different environments: (1) The Space Shuttle cargo bay in low Earth orbit (the EOIM-3 space flight experiment), (2) a high-velocity neutral atom beam system (HVAB) at Los Alamos National Laboratory (LANL), and (3) a microwave-plasma flowing-discharge system at JSC. The Space Shuttle and the high velocity atom beam systems produce atom-surface collision energies ranging from 0.1 to 7 eV (hyperthermal atoms) under high-vacuum conditions, while the flowing discharge system produces a 0.065 eV surface collision energy at a total pressure of 2 Torr. Data obtained in the three different O-atom environments referred to above show that the rate of O-atom reaction with polymeric materials is strongly dependent on atom kinetic energy, obeying a reactive scattering law which suggests that atom kinetic energy is directly available for overcoming activation barriers in the reaction. General relationships between polymer reactivity with O atoms and polymer composition and molecular structure have been determined. In addition, vacuum ultraviolet photochemical effects have been shown to dominate the reaction of O atoms with fluorocarbon polymers. Finally, studies of the materials chemistry of O atoms have produced results which may be of interest to technologists outside the aerospace industry. Atomic oxygen 'spin-off' or 'dual use' technologies in the areas of anisotropic etching in microelectronic materials and device processing, as well as surface chemistry engineering of porous solid materials are described.

  20. Smoke Mask

    Science.gov (United States)

    2003-01-01

    Smoke inhalation injury from the noxious products of fire combustion accounts for as much as 80 percent of fire-related deaths in the United States. Many of these deaths are preventable. Smoke Mask, Inc. (SMI), of Myrtle Beach, South Carolina, is working to decrease these casualties with its line of life safety devices. The SMI personal escape hood and the Guardian Filtration System provide respiratory protection that enables people to escape from hazardous and unsafe conditions. The breathing filter technology utilized in the products is specifically designed to supply breathable air for 20 minutes. In emergencies, 20 minutes can mean the difference between life and death.

  1. Fe{sub 3}O{sub 4} submicron spheroids as anode materials for lithium-ion batteries with stable and high electrochemical performance

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Suqing; Zhang, Jingying; Chen, Chunhua [CAS Key Laboratory of Materials for Energy Conversion, Department of Materials Science and Engineering, University of Science and Technology of China, Hefei, Anhui 230026 (China)

    2010-08-15

    A magnetite (Fe{sub 3}O{sub 4}) powder composed of uniform sub-micrometer spherical particles has been successfully synthesized by a hydrothermal method at low temperature. X-ray diffraction, scanning electron microscopy, transmission electron microscopy and galvanostatic cell cycling are employed to characterize the structure and electrochemical performance of the as-prepared Fe{sub 3}O{sub 4} spheroids. The magnetite shows a stable and reversible capacity of over 900 mAh g{sup -1} during up to 60 cycles and good rate capability. The experimental results suggest that the Fe{sub 3}O{sub 4} synthesized by this method is a promising anode material for high energy-density lithium-ion batteries. (author)

  2. Zr doping effect with low-cost solid-state reaction method to synthesize submicron Li4Ti5O12 anode material

    Science.gov (United States)

    Seo, Inseok; Lee, Cheul-Ro; Kim, Jae-Kwang

    2017-09-01

    To improve the electrochemical properties, fine Zr-doping Li4Ti5O12 anode materials for rechargeable lithium batteries with a uniform particle size distribution were synthesized by a modified solid-state reaction using fine Li2CO3 and TiO2 (anatase) powders as precursors with a Li:Ti molar ratio of 4:5. The use of fine Li2CO3 and TiO2 (anatase) powders as precursors prevented the formation of ZrO2 at 0.1 mol Zr-doping. XRD analysis revealed that the substitution of Zr for Ti leads to the increase of lattice parameters, allowing improved Li diffusion. The discharge capacity retention increased slightly with Zr-doping and the 0.1 mol Zr-doped Li4Ti5O12 electrode achieved 99% retention of discharge capacity.

  3. Stencil nano lithography based on a nanoscale polymer shadow mask: towards organic nanoelectronics.

    Science.gov (United States)

    Yun, Hoyeol; Kim, Sangwook; Kim, Hakseong; Lee, Junghyun; McAllister, Kirstie; Kim, Junhyung; Pyo, Sengmoon; Sung Kim, Jun; Campbell, Eleanor E B; Hyoung Lee, Wi; Wook Lee, Sang

    2015-05-11

    A stencil lithography technique has been developed to fabricate organic-material-based electronic devices with sub-micron resolution. Suspended polymethylmethacrylate (PMMA) membranes were used as shadow masks for defining organic channels and top electrodes. Arrays of pentacene field effect transistors (FETs) with various channel lengths from 50 μm down to 500 nm were successfully produced from the same batch using this technique. Electrical transport measurements showed that the electrical contacts of all devices were stable and the normalized contact resistances were much lower than previously studied organic FETs. Scaling effects, originating from the bulk space charge current, were investigated by analyzing the channel-length-dependent mobility and hysteresis behaviors. This novel lithography method provides a reliable means for studying the fundamental transport properties of organic materials at the nanoscale as well as enabling potential applications requiring the fabrication of integrated organic nanoelectronic devices.

  4. A Fast, Versatile Nanoprobe for Complex Materials: The Sub-micron Resolution X-ray Spectroscopy Beamline at NSLS-II (491st Brookhaven Lecture)

    Energy Technology Data Exchange (ETDEWEB)

    Thieme, Juergen [BNL Photon Sciences Directorate

    2014-02-06

    Time is money and for scientists who need to collect data at research facilities like Brookhaven Lab’s National Synchrotron Light Source (NSLS), “beamtime” can be a precious commodity. While scanning a complex material with a specific technique and standard equipment today would take days to complete, researchers preparing to use brighter x-rays and the new sub-micron-resolution x-ray spectroscopy (SRX) beamline at the National Synchrotron Light Source II (NSLS-II) could scan the same sample in greater detail with just a few hours of beamtime. Talk about savings and new opportunities for researchers! Users will rely on these tools for locating trace elements in contaminated soils, developing processes for nanoparticles to deliver medical treatments, and much more. Dr. Thieme explains benefits for next-generation research with spectroscopy and more intense x-rays at NSLS-II. He discusses the instrumentation, features, and uses for the new SRX beamline, highlighting its speed, adjustability, and versatility for probing samples ranging in size from millimeters down to the nanoscale. He will talk about complementary beamlines being developed for additional capabilities at NSLS-II as well.

  5. The surface characterisation and comparison of two potential sub-micron, sugar bulking excipients for use in low-dose, suspension formulations in metered dose inhalers.

    Science.gov (United States)

    James, Jeff; Crean, Barry; Davies, Martyn; Toon, Richard; Jinks, Phil; Roberts, Clive J

    2008-09-01

    This study compares the surface characteristics and surface energetics of two potential bulking excipients, anhydrous sub-micron alpha-lactose and sub-micron sucrose, for use with low-dose, suspension formulations in pressurised metered dose inhalers (pMDIs). Both sub-micron bulking excipients are processed from parent materials (alpha-lactose monohydrate/alpha-lactose monohydrate and silk grade sucrose, respectively) so the surface characteristics of each material were determined and compared. Additionally, the surface energetics and adhesive interactions between each sub-micron bulking excipient and some chosen active pharmaceutical ingredients (APIs) used in pMDI formulations were also determined. From this data, it was possible to predict the potential degree of interaction between the APIs and each sub-micron bulking excipient, thus determining suitable API-excipient combinations for pMDI formulation optimisation. Salmon calcitonin was also investigated as a potential API due to the current interest in, and the potential low-dose requirements for, the pulmonary delivery of proteins. The size and morphology of each sub-micron excipient (and parent materials) were determined using scanning electron microscopy (SEM) and the crystalline nature of each sub-micron excipient and parent material was assessed using X-ray diffraction (XRD). The surface chemistry of each sub-micron excipient was analysed using X-ray photoelectron spectroscopy (XPS). The surface energies of each sub-micron excipient, along with their respective parent materials and any intermediates, were determined using two techniques. The surface energies of these materials were determined via (a) single particle adhesive interactions using atomic force microscopy (AFM) and (b) 'bulk' material surface interactions using contact angle measurements (CA). From the CA data, it was possible to calculate the theoretical work of adhesion values for each API-excipient interaction using the surface component

  6. Submicron plasticity: yield stress, dislocation avalanches, and velocity distribution

    OpenAIRE

    Ispánovity, Péter Dusán; Groma, István; Györgyi, Géza; Csikor, Ferenc F.; Weygand, Daniel

    2010-01-01

    The existence of a well defined yield stress, where a macroscopic piece of crystal begins to plastically flow, has been one of the basic observations of materials science. In contrast to macroscopic samples, in micro- and nanocrystals the strain accumulates in distinct, unpredictable bursts, which makes controlled plastic forming rather difficult. Here we study by simulation, in two and three dimensions, plastic deformation of submicron objects under increasing stress. We show that, while the...

  7. Masks and Other Disguises.

    Science.gov (United States)

    Ploghoft, Debra

    Instructions for making simple masks are provided in this guide for teachers of elementary children. Directions with illustrations are given for constructing masks from paper plates, construction paper, plastic milk jugs, and papier-mache. Ideas include a clown mask, a flower mask, a top hat, a paper crown, and "Groucho" glasses. Types…

  8. Submicron bioactive glass tubes for bone tissue engineering.

    Science.gov (United States)

    Xie, Jingwei; Blough, Eric R; Wang, Chi-Hwa

    2012-02-01

    Herein we describe a method to fabricate submicron bioactive glass tubes using sol-gel and coaxial electrospinning techniques for applications in bone tissue engineering. Heavy mineral oil and gel solution were delivered by two independent syringe pumps during the coaxial electrospinning process. Subsequently, submicron bioactive glass tubes were obtained by removal of poly(vinyl pyrrolidone) and heavy mineral oil via calcination at 600 °C for 5 h. Tubular structure was confirmed by scanning electron microscopy and transmission electron microscopy imaging. We examined the bioactivity of submicron bioactive glass tubes and fibers and evaluated their biocompatibility, using electrospun poly(ε-caprolactone) fibers--a bioinactive material--for comparison. The bioactivity of the glass tubes was examined in a simulated body fluid and they demonstrated the formation of hydroxyapatite-like minerals on both the outer and inner surfaces. In contrast, mineralization only occurred on their surface for bioactive glass solid fibers. Energy-dispersive X-ray data suggested that the bioactive glass tubes had a faster induction of mineral formation than the solid fibers. We demonstrate that the proliferation rate of mouse preosteoblastic MC3T3-E1 cells on bioactive glass tubes was comparable to that on solid fibers. We also show that bioactive glass tubes can be loaded with a model protein drug, bovine serum albumin, and that these structures exhibit delayed release properties. The bioactivity of released lysozyme can be as high as 90.9%. Taken together, these data suggest that submicron bioactive glass tubes could hold great potential for use in bone tissue engineering as well as topical drug or gene delivery. Copyright © 2011 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

  9. Submicron Features in Higher Manganese Silicide

    Directory of Open Access Journals (Sweden)

    Yatir Sadia

    2013-01-01

    Full Text Available The world energy crisis had increased the demand for alternative energy sources and as such is one of the topics at the forefront of research. One way for reducing energy consumption is by thermoelectricity. Thermoelectric effects enable direct conversion of thermal into electrical energy. Higher manganese silicide (HMS, MnSi1.75 is one of the promising materials for applications in the field of thermoelectricity. The abundance and low cost of the elements, combined with good thermoelectric properties and high mechanical and chemical stability at high temperatures, make it very attractive for thermoelectric applications. Recent studies have shown that Si-rich HMS has improved thermoelectric properties. The most interesting of which is the unusual reduction in thermal conductivity. In the current research, transmission (TEM and scanning (SEM electron microscopy as well as X-ray diffraction methods were applied for investigation of the govern mechanisms resulting in very low thermal conductivity values of an Si-rich HMS composition, following arc melting and hot-pressing procedures. In this paper, it is shown that there is a presence of sub-micron dislocations walls, stacking faults, and silicon and HMS precipitates inside each other apparent in the matrix, following a high temperature (0.9 Tm hot pressing for an hour. These are not just responsible for the low thermal conductivity values observed but also indicate the ability to create complicate nano-structures that will last during the production process and possibly during the application.

  10. On the dry deposition of submicron particles

    Energy Technology Data Exchange (ETDEWEB)

    Wesely, M. L.

    1999-10-08

    The air-surface exchange of particles can have a strong role in determining the amount, size, and chemical composition of particles in the troposphere. Here the authors consider only dry processes (deposition processes not directly aided by precipitation) and mostly address particles less than about 2 {micro}m in diameter (often referred to as submicron particles because most of such particles are less than 1 {micro}m in diameter). The processes that control the dry exchange of particulate material between the atmosphere and the surface of the Earth are numerous, highly varied, and sometimes poorly understood. As a result, determining which of the surface processes to parameterize or simulate in modeling the tropospheric mass budget of a particulate substance can be a significant challenge. Dry deposition, for example, can be controlled by a combination of Brownian diffusion, impaction, interception, and gravitational settling, depending on the size of the particles, the roughness of the surface on both micrometeorological and microscopic scales, the geometrical structure of vegetative canopies, and other surface characteristics such as wetness. Particles can be added to the lower atmosphere by resuspension from land surfaces and sea spray. The roles of rapid gas-to-particle conversion and growth or shrinkage of particles as a result of water condensation or evaporation in the lower few meters of the atmosphere can also have a significant impact on particle concentrations in the lower atmosphere. Here, a few micrometeorological observations and inferences on particle air-surface exchange are briefly addressed.

  11. Visual masking & schizophrenia

    Directory of Open Access Journals (Sweden)

    Michael H. Herzog

    2015-06-01

    Full Text Available Visual masking is a frequently used tool in schizophrenia research. Visual masking has a very high sensitivity and specificity and masking paradigms have been proven to be endophenotypes. Whereas masking is a powerful technique to study schizophrenia, the underlying mechanisms are discussed controversially. For example, for more than 25 years, masking deficits of schizophrenia patients were mainly attributed to a deficient magno-cellular system (M-system. Here, we show that there is very little evidence that masking deficits are magno-cellular deficits. We will discuss the magno-cellular and other approaches in detail and highlight their pros and cons.

  12. Suppression in simultaneous masking.

    Science.gov (United States)

    Fastl, H; Bechly, M

    1983-09-01

    Suppression, i.e., the decrease of masked threshold caused by the addition of a second masker M2 to a first masker M1, is measured for the case of simultaneous masking. The magnitude of suppression decreases with increasing test tone duration; pulsed maskers elicit somewhat more suppression than continuous maskers. In comparison to suppression effects obtained in nonsimultaneous masking (post-masking, pulsation threshold) suppression in simultaneous masking is considerably smaller and was found only at the lower slopes of the two maskers. Suppression in simultaneous masking would not be predicted by those models of suppression which require nonsimultaneous presentation of maskers and test sound.

  13. Binary Masking & Speech Intelligibility

    DEFF Research Database (Denmark)

    Boldt, Jesper

    experiments under ideal conditions or as experiments under more realistic conditions useful for real-life applications such as hearing aids. In the experiments under ideal conditions, the previously defined ideal binary mask is evaluated using hearing impaired listeners, and a novel binary mask -- the target...... binary mask -- is introduced. The target binary mask shows the same substantial increase in intelligibility as the ideal binary mask and is proposed as a new reference for binary masking. In the category of real-life applications, two new methods are proposed: a method for estimation of the ideal binary...... mask using a directional system and a method for correcting errors in the target binary mask. The last part of the thesis, proposes a new method for objective evaluation of speech intelligibility....

  14. Assessment of molecular contamination in mask pod

    Science.gov (United States)

    Foray, Jean Marie; Dejaune, Patrice; Sergent, Pierre; Gough, Stuart; Cheung, D.; Davenet, Magali; Favre, Arnaud; Rude, C.; Trautmann, T.; Tissier, Michel; Fontaine, H.; Veillerot, M.; Avary, K.; Hollein, I.; Lerit, R.

    2008-04-01

    Context/ study Motivation: Contamination and especially Airbone Molecular Contamination (AMC) is a critical issue for mask material flow with a severe and fairly unpredictable risk of induced contamination and damages especially for 193 nm lithography. It is therefore essential to measure, to understand and then try to reduce AMC in mask environment. Mask material flow was studied in a global approach by a pool of European partners, especially within the frame of European MEDEA+ project, so called "MUSCLE". This paper deals with results and assessment of mask pod environment in term of molecular contamination in a first step, then in a second step preliminary studies to reduce mask pod influence and contamination due to material out gassing. Approach and techniques: A specific assessment of environmental / molecular contamination along the supply chain was performed by all partners. After previous work presented at EMLC 07, further studies were performed on real time contamination measurement pod at different sites locations (including Mask manufacturing site, blank manufacturing sites, IC fab). Studies were linked to the main critical issues: cleaning, storage, handling, materials and processes. Contamination measurement campaigns were carried out along the mask supply chain using specific Adixen analyzer in order to monitor in real time organic contaminants (ppb level) in mask pods. Key results would be presented: VOC, AMC and humidity level on different kinds of mask carriers, impact of basic cleaning on pod outgassing measurement (VOC, NH3), and process influence on pod contamination... In a second step, preliminary specific pod conditioning studies for better pod environment were performed based on Adixen vacuum process. Process influence had been experimentally measured in term of molecular outgassing from mask pods. Different AMC experimental characterization methods had been carried out leading to results on a wide range of organic and inorganic

  15. Keeping African Masks Real

    Science.gov (United States)

    Waddington, Susan

    2012-01-01

    Art is a good place to learn about our multicultural planet, and African masks are prized throughout the world as powerfully expressive artistic images. Unfortunately, multicultural education, especially for young children, can perpetuate stereotypes. Masks taken out of context lose their meaning and the term "African masks" suggests that there is…

  16. Entropy Masking

    Science.gov (United States)

    Watson, Andrew B.; Stone, Leland (Technical Monitor)

    1997-01-01

    This paper details two projects that use the World Wide Web (WWW) for dissemination of curricula that focus on remote sensing. 1) Presenting grade-school students with the concepts used in remote sensing involves educating the teacher and then providing the teacher with lesson plans. In a NASA-sponsored project designed to introduce students in grades 4 through 12 to some of the ideas and terminology used in remote sensing, teachers from local grade schools and middle schools were recruited to write lessons about remote sensing concepts they could use in their classrooms. Twenty-two lessons were produced and placed in seven modules that include: the electromagnetic spectrum, two- and three-dimensional perception, maps and topography, scale, remote sensing, biotic and abiotic concepts, and landscape chi rise. Each lesson includes a section that evaluates what students have learned by doing the exercise. The lessons, instead of being published in a workbook and distributed to a limited number of teachers, have been placed on a WWW server, enabling much broader access to the package. This arrangement also allows for the lessons to be modified after feedback from teachers accessing the package. 2) Two-year colleges serve to teach trade skills, prepare students for enrollment in senior institutions of learning, and more and more, retrain students who have college degrees in new technologies and skills. A NASA-sponsored curriculum development project is producing a curriculum using remote sensing analysis an Earth science applications. The project has three major goals. First, it will implement the use of remote sensing data in a broad range of community college courses. Second, it will create curriculum modules and classes that are transportable to other community colleges. Third, the project will be an ongoing source of data and curricular materials to other community colleges. The curriculum will have these course pathways to a certificate; a) a Science emphasis, b

  17. Novel Translucent and Strong Submicron Alumina Ceramics for Dental Restorations.

    Science.gov (United States)

    Zhao, M; Sun, Y; Zhang, J; Zhang, Y

    2017-10-01

    An ideal ceramic restorative material should possess excellent aesthetic and mechanical properties. We hypothesize that the high translucency and strength of polycrystalline ceramics can be achieved through microstructural tailoring. The aim of this study is to demonstrate the superior optical and mechanical properties of a new class of submicron grain-sized alumina ceramics relative to the current state-of-the-art dental ceramic materials. The translucency, the in-line transmission ( TIT) in particular, of these submicron alumina ceramics has been examined with the Rayleigh-Gans-Debye light-scattering model. The theoretical predictions related very well with the measured TIT values. The translucency parameter ( TP) and contrast ratio ( CR) of the newly developed aluminas were measured with a reflectance spectrophotometer on a black-and-white background. For comparison, the TIT, TP, and CR values for a variety of dental ceramics, mostly measured in-house but also cited from the literature, were included. The flexural strength of the aluminas was determined with the 4-point bending test. Our findings have shown that for polycrystalline alumina ceramics, an average grain size <1 µm coupled with a porosity level <0.7% could yield translucency values ( TIT, TP, CR) similar to those of the commercial high-translucency porcelains. These values are far superior to the high-translucency lithium disilicate glass-ceramic and zirconias, including the most translucent cubic-containing zirconias. The strength of these submicron grain-sized aluminas was significantly higher than that of the cubic-containing zirconia (e.g., Zpex Smile) and lithia-based glass-ceramics (e.g., IPS e.max CAD HT). A coarse-grained alumina could also reach a translucency level comparable to that of dental porcelain. However, the relatively low strength of this material has limited its clinical indications to structurally less demanding applications, such as orthodontic brackets. With a combined high

  18. Effective Use of Focused Ion Beam (FIB) in Investigating Fundamental Mechanical Properties of Metals at the Sub-Micron Scale

    OpenAIRE

    Greer, Julia R.

    2006-01-01

    Recent advances in the 2-beam focused ion beams technology (FIB) have enabled researchers to not only perform high-precision nanolithography and micro-machining, but also to apply these novel fabrication techniques to investigating a broad range of materials' properties at the submicron and nano-scales. In our work, the FIB is utilized in manufacturing of sub-micron cylinders, or nano-pillars, as well as of TEM cross-sections to directly investigate plasticity of metals at thes...

  19. Contact printed masks for 3D microfabrication in negative resists

    OpenAIRE

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling a...

  20. Penetration of sub-micron particles into dentinal tubules using ultrasonic cavitation.

    Science.gov (United States)

    Vyas, N; Sammons, R L; Pikramenou, Z; Palin, W M; Dehghani, H; Walmsley, A D

    2017-01-01

    Functionalised silica sub-micron particles are being investigated as a method of delivering antimicrobials and remineralisation agents into dentinal tubules. However, their methods of application are not optimised, resulting in shallow penetration and aggregation. The aim of this study is to investigate the impact of cavitation occurring around ultrasonic scalers for enhancing particle penetration into dentinal tubules. Dentine slices were prepared from premolar teeth. Silica sub-micron particles were prepared in water or acetone. Cavitation from an ultrasonic scaler (Satelec P5 Newtron, Acteon, France) was applied to dentine slices immersed inside the sub-micron particle solutions. Samples were imaged with scanning electron microscopy (SEM) to assess tubule occlusion and particle penetration. Qualitative observations of SEM images showed some tubule occlusion. The particles could penetrate inside the tubules up to 60μm when there was no cavitation and up to ∼180μm when there was cavitation. The cavitation bubbles produced from an ultrasonic scaler may be used to deliver sub-micron particles into dentine. This method has the potential to deliver such particles deeper into the dentinal tubules. Cavitation from a clinical ultrasonic scaler may enhance penetration of sub-micron particles into dentinal tubules. This can aid in the development of novel methods for delivering therapeutic clinical materials for hypersensitivity relief and treatment of dentinal caries. Copyright © 2016 Elsevier Ltd. All rights reserved.

  1. Surfactants and submicron sea spray generation

    NARCIS (Netherlands)

    Sellegri, K.; O'Dowd, C.D.; Yoon, Y.J.; Jennings, S.G.; Leeuw, G. de

    2006-01-01

    Laboratory experiments have been carried out to elucidate the role of surfactants on the primary marine aerosol production of submicron marine aerosols. A synthetic surfactant SDS was used in conjunction with artificially generated seawater, and the resultant bubble-mediated aerosol produced was

  2. Mountain pine beetle-killed lodgepole pine for the production of submicron lignocellulose fibrils

    Science.gov (United States)

    Ingrid Hoeger; Rolland Gleisner; Jose Negron; Orlando J. Rojas; J. Y. Zhu

    2014-01-01

    The elevated levels of tree mortality attributed to mountain pine beetle (MPB) (Dendroctonus ponderosae Hopkins) in western North American forests create forest management challenges. This investigation introduces the production of submicron or nanometer lignocellulose fibrils for value-added materials from the widely available resource represented by dead pines after...

  3. How the global layout of the mask influences masking strength.

    Science.gov (United States)

    Ghose, Tandra; Hermens, Frouke; Herzog, Michael H

    2012-12-10

    In visual backward masking, the perception of a target is influenced by a trailing mask. Masking is usually explained by local interactions between the target and the mask representations. However, recently it has been shown that the global spatial layout of the mask rather than its local structure determines masking strength (Hermens & Herzog, 2007). Here, we varied the mask layout by spatial, luminance, and temporal cues. We presented a vernier target followed by a mask with 25 elements. Performance deteriorated when the length of the two mask elements neighboring the target vernier was doubled. However, when the length of every second mask element was doubled, performance improved. When the luminance of the neighboring elements was doubled, performance also deteriorated but no improvement in performance was observed when every second element had a double luminance. For temporal manipulations, a complex nonmonotonic masking function was observed. Hence, changes in the mask layout by spatial, luminance, and temporal cues lead to highly different results.

  4. Lightweight Face Mask

    Science.gov (United States)

    Cason, W. E. I.; Baucom, R. M.; Evans, R. C.

    1982-01-01

    Lightweight face mask originally developed to protect epileptic patients during seizures could have many other medical and nonmedical applications such as muscular distrophy patients, football linesmen and riot-control police. Masks are extremely lightweight, the lightest of the configurations weighing only 136 grams.

  5. Submicron magnetic core conducting polypyrrole polymer shell: Preparation and characterization.

    Science.gov (United States)

    Tenório-Neto, Ernandes Taveira; Baraket, Abdoullatif; Kabbaj, Dounia; Zine, Nadia; Errachid, Abdelhamid; Fessi, Hatem; Kunita, Marcos Hiroiuqui; Elaissari, Abdelhamid

    2016-04-01

    Magnetic particles are of great interest in various biomedical applications, such as, sample preparation, in vitro biomedical diagnosis, and both in vivo diagnosis and therapy. For in vitro applications and especially in labs-on-a-chip, microfluidics, microsystems, or biosensors, the needed magnetic dispersion should answer various criteria, for instance, submicron size in order to avoid a rapid sedimentation rate, fast separations under an applied magnetic field, and appreciable colloidal stability (stable dispersion under shearing process). Then, the aim of this work was to prepare highly magnetic particles with a magnetic core and conducting polymer shell particles in order to be used not only as a carrier, but also for the in vitro detection step. The prepared magnetic seed dispersions were functionalized using pyrrole and pyrrole-2-carboxylic acid. The obtained core-shell particles were characterized in terms of particle size, size distribution, magnetization properties, FTIR analysis, surface morphology, chemical composition, and finally, the conducting property of those particles were evaluated by cyclic voltammetry. The obtained functional submicron highly magnetic particles are found to be conducting material bearing function carboxylic group on the surface. These promising conducting magnetic particles can be used for both transport and lab-on-a-chip detection. Copyright © 2015. Published by Elsevier B.V.

  6. Micromagnetic Simulations of Submicron Cobalt Dots

    Energy Technology Data Exchange (ETDEWEB)

    Parker, G.J.; Cerjan, C.

    1999-08-30

    Numerical simulations of submicron Co extruded elliptical dots were performed to illustrate the relative importance of different physical parameters on the switching behavior in the easy direction. Shape, size, magnetic moment magnitude and crystalline anisotropy, both magnitude and distribution, were varied. The simulation includes calculation of the magnetostatic, exchange and crystalline anisotropy fields on a structured mesh using finite difference techniques. The smooth boundary of the dots are accurately represented by use of the Embedded Curve Boundary method.

  7. Submicron Surface-Patterned Fibers and Textiles

    Science.gov (United States)

    2016-11-04

    The patterned fiber surface behaves as an optical diffraction grating when the feature size is comparable with visible light wavelengths. A red laser...the optical fiber gratings For the first diffraction order of the micron and submicron patterned fiber , we utilize the formula α tanh (where s...e) SEM images of patterned PMMA fiber are depicted. The inset shows the cross- section of this fiber . Submitted to 20 Figure S3

  8. Contact printed masks for 3D microfabrication in negative resists

    DEFF Research Database (Denmark)

    Häfliger, Daniel; Boisen, Anja

    2005-01-01

    We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded into the ......We present a process based on contact printed shadow masks for three dimensional microfabrication of soft and sensitive overhanging membranes in SU-8. A metal mask is transferred onto unexposed SU-8 from an elastomer stamp made of polydimethylsiloxane. This mask is subsequently embedded...... into the negative resist to protect buried material from UV-exposure. Unlike direct evaporation-deposition of a mask onto the SU-8, printing avoids high stress and radiation, thus preventing resist wrinkling and prepolymerization. We demonstrate effective monolithic fabrication of soft, 4-μm thick and 100-μm long...

  9. Laser direct writing using submicron-diameter fibers.

    Science.gov (United States)

    Tian, Feng; Yang, Guoguang; Bai, Jian; Xu, Jianfeng; Hou, Changlun; Liang, Yiyong; Wang, Kaiwei

    2009-10-26

    In this paper, a novel direct writing technique using submicron-diameter fibers is presented. The submicron-diameter fiber probe serves as a tightly confined point source and it adopts micro touch mode in the process of writing. The energy distribution of direct writing model is analyzed by Three-Dimension Finite-Difference Time-Domain method. Experiments demonstrate that submicron-diameter fiber direct writing has some advantages: simple process, 350-nm-resolution (lower than 442-nm-wavelength), large writing area, and controllable width of lines. In addition, by altering writing direction of lines, complex submicron patterns can be fabricated.

  10. Submicron Plasticity: Yield Stress, Dislocation Avalanches, and Velocity Distribution

    Science.gov (United States)

    Ispánovity, Péter Dusán; Groma, István; Györgyi, Géza; Csikor, Ferenc F.; Weygand, Daniel

    2010-08-01

    The existence of a well-defined yield stress, where a macroscopic crystal begins to plastically flow, has been a basic observation in materials science. In contrast with macroscopic samples, in microcrystals the strain accumulates in random bursts, which makes controlled plastic formation difficult. Here we study by 2D and 3D simulations the plastic deformation of submicron objects under increasing stress. We show that, while the stress-strain relation of individual samples exhibits jumps, its average and mean deviation still specify a well-defined critical stress. The statistical background of this phenomenon is analyzed through the velocity distribution of dislocations, revealing a universal cubic decay and the appearance of a shoulder due to dislocation avalanches.

  11. Enhancement in electrical conductivity of pastes containing submicron Ag-coated Cu filler with palmitic acid surface modification

    Science.gov (United States)

    Choi, Eun Byeol; Lee, Jong-Hyun

    2017-09-01

    The fabrication and applied use of submicron Ag-coated Cu (Cu@Ag) particles as a filler material for epoxy-based conductive pastes having the advantages of a lower material cost and antioxidation behavior were studied. Submicron Cu@Ag particles were successfully prepared and surface-modified using palmitic acid. Diffuse reflectance infrared Fourier transform spectroscopy and thermogravimetric differential scanning calorimetry results indicated the formation of an organic layer by the chemical interaction between the Cu@Ag surface and palmitic acid and the survival of the organic layer after treatment at 160 °C for 3 h in air. The printed pastes containing both commercial micron Cu@Ag flakes and the fabricated submicron Cu@Ag particles showed a greatly reduced electrical resistivity (4.68 × 10-4 Ω cm) after surface modification compared to an initial value of 1.85 × 10-3 Ω cm when cured.

  12. Masked fake face detection using radiance measurements.

    Science.gov (United States)

    Kim, Youngshin; Na, Jaekeun; Yoon, Seongbeak; Yi, Juneho

    2009-04-01

    This research presents a novel 2D feature space where real faces and masked fake faces can be effectively discriminated. We exploit the reflectance disparity based on albedo between real faces and fake materials. The feature vector used consists of radiance measurements of the forehead region under 850 and 685 nm illuminations. Facial skin and mask material show linearly separable distributions in the feature space proposed. By simply applying Fisher's linear discriminant, we have achieved 97.78% accuracy in fake face detection. Our method can be easily implemented in commercial face verification systems.

  13. Orion Emergency Mask Approach

    Science.gov (United States)

    Tuan, George C.; Graf, John C.

    2009-01-01

    Emergency mask approach on Orion poses a challenge to the traditional Shuttle or Station approaches. Currently, in the case of a fire or toxic spill event, the crew utilizes open loop oxygen masks that provide the crew with oxygen to breath, but also dumps the exhaled oxygen into the cabin. For Orion, with a small cabin volume, the extra oxygen will exceed the flammability limit within a short period of time, unless a nitrogen purge is also provided. Another approach to a fire or toxic spill event is the use of a filtering emergency masks. These masks utilize some form of chemical beds to scrub the air clean of toxic providing the crew safe breathing air for a period without elevating the oxygen level in the cabin. Using the masks and a form of smoke-eater filter, it may be possible to clean the cabin completely or to a level for safe transition to a space suit to perform a cabin purge. Issues with filters in the past have been the reaction time, breakthroughs, and high breathing resistance. Development in a new form of chemical filters has shown promise to make the filtering approach feasible.

  14. A Facile Method for Separating and Enriching Nano and Submicron Particles from Titanium Dioxide Found in Food and Pharmaceutical Products.

    Science.gov (United States)

    Faust, James J; Doudrick, Kyle; Yang, Yu; Capco, David G; Westerhoff, Paul

    2016-01-01

    Recent studies indicate the presence of nano-scale titanium dioxide (TiO2) as an additive in human foodstuffs, but a practical protocol to isolate and separate nano-fractions from soluble foodstuffs as a source of material remains elusive. As such, we developed a method for separating the nano and submicron fractions found in commercial-grade TiO2 (E171) and E171 extracted from soluble foodstuffs and pharmaceutical products (e.g., chewing gum, pain reliever, and allergy medicine). Primary particle analysis of commercial-grade E171 indicated that 54% of particles were nano-sized (i.e., particle analysis of five consumer goods intended to be ingested revealed differences in the percent of nano-sized particles from 32%‒58%. Separation and enrichment of nano- and submicron-sized particles from commercial-grade E171 and E171 isolated from foodstuffs and pharmaceuticals was accomplished using rate-zonal centrifugation. Commercial-grade E171 was separated into nano- and submicron-enriched fractions consisting of a nano:submicron fraction of approximately 0.45:1 and 3.2:1, respectively. E171 extracted from gum had nano:submicron fractions of 1.4:1 and 0.19:1 for nano- and submicron-enriched, respectively. We show a difference in particle adhesion to the cell surface, which was found to be dependent on particle size and epithelial orientation. Finally, we provide evidence that E171 particles are not immediately cytotoxic to the Caco-2 human intestinal epithelium model. These data suggest that this separation method is appropriate for studies interested in isolating the nano-sized particle fraction taken directly from consumer products, in order to study separately the effects of nano and submicron particles.

  15. Phase transformation and intense 2.7 μm emission from Er3+ doped YF3/YOF submicron-crystals.

    Science.gov (United States)

    Chai, Guanqi; Dong, Guoping; Qiu, Jianrong; Zhang, Qinyuan; Yang, Zhongmin

    2013-01-01

    Yttrium fluoride YF3:Er(3+) and yttrium oxyfluoride YOF:Er(3+) submicron-crystals with mid-infrared fluorescent emissions were synthesized for the first time. The rhombohedral phase YOF submicron-crystals were synthesized by the crystalline phase transformation from pure orthorhombic YF3 submicron-crystals, which were prepared by co-precipitation method. The composition and morphology were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM) and transmission electron microscopy (TEM), which showed that submicron-crystals were quasi-spherical with the particle size of ~400 nm. A novel formation mechanism of YOF submicron-crystals was proposed. Photoluminescence (PL) spectra indicated the 2.7 μm emission of Er(3+) has remarkably enhanced with the increase of Er(3+) doping concentration, and a novel dynamic circulatory energy transfer mechanism was proposed. Fourier transform infrared spectra (FTIR) were used to demonstrate the change of hydroxyl content. These oxyfluoride submicron-crystals provide a new material for nano/submicron-crystals-glass composites, and open a brand new field for the realization of mid-infrared micro/nano-lasers.

  16. Microscopic imaging ellipsometry of submicron-scale bacterial cells ...

    African Journals Online (AJOL)

    Microscopic imaging ellipsometry of submicron-scale bacterial cells. ... Conclusion: MIE is a sensitive non-optical technique that can be used to image biological systems without the need for labeling of molecules. Keywords: Objective plane, Imaging ellipsometry, Submicron-scale bacterial cells, Streptococcus mutans, ...

  17. The Moody Mask Model

    DEFF Research Database (Denmark)

    Larsen, Bjarke Alexander; Andkjær, Kasper Ingdahl; Schoenau-Fog, Henrik

    2015-01-01

    This paper proposes a new relation model, called "The Moody Mask model", for Interactive Digital Storytelling (IDS), based on Franceso Osborne's "Mask Model" from 2011. This, mixed with some elements from Chris Crawford's Personality Models, is a system designed for dynamic interaction between...... characters in an interactive setting. The system was evaluated with a quantitative study investigating the impact of interactivity, with some open-ended questions for qualitative analysis. Furthermore, it was compared with other IDS applications, using the common evaluation method "UxTool". We found...... that the Moody Mask model was not signicantly improved by adding interactivity, except in a few logical areas. It also performed worse than other IDS applications in all areas. The participants reported issues with the lack of feedback from direct actions, repetitive actions, and problems with the story scenario...

  18. Retention of pediatric bag-mask ventilation efficacy skill by inexperienced medical student resuscitators using standard bag-mask ventilation masks, pocket masks, and blob masks.

    Science.gov (United States)

    Kitagawa, Kory H; Nakamura, Nina M; Yamamoto, Loren

    2006-03-01

    To measure the ventilation efficacy with three single-sized mask types on infant and child manikin models. Medical students were recruited as study subjects inasmuch as they are inexperienced resuscitators. They were taught proper bag-mask ventilation (BMV) according to the American Heart Association guidelines on an infant and a child manikin. Subjects completed a BMV attempt successfully using the adult standard mask (to simulate the uncertainty of mask selection), pocket mask, and blob mask. Each attempt consisted of 5 ventilations assessed by chest rise of the manikin. Study subjects were asked which mask was easiest to use. Four to six weeks later, subjects repeated the procedure with no instructions (to simulate an emergency BMV encounter without immediate pre-encounter teaching). Forty-six volunteer subjects were studied. During the first attempt, subjects preferred the standard and blob masks over the pocket mask. For the second attempt, the blob mask was preferred over the standard mask, and few liked the pocket mask. Using the standard, blob, and pocket masks on the child manikin, 39, 42, and 20 subjects, respectively, were able to achieve adequate ventilation. Using the standard, blob, and pocket masks on the infant manikin, 45, 45, and 11 subjects, respectively, were able to achieve adequate ventilation. Both the standard and blob masks are more effective than the pocket mask at achieving adequate ventilation on infant and child manikins in this group of inexperienced medical student resuscitators, who most often preferred the blob mask.

  19. Masked mycotoxins: A review

    Science.gov (United States)

    Berthiller, Franz; Crews, Colin; Dall'Asta, Chiara; Saeger, Sarah De; Haesaert, Geert; Karlovsky, Petr; Oswald, Isabelle P; Seefelder, Walburga; Speijers, Gerrit; Stroka, Joerg

    2013-01-01

    The aim of this review is to give a comprehensive overview of the current knowledge on plant metabolites of mycotoxins, also called masked mycotoxins. Mycotoxins are secondary fungal metabolites, toxic to human and animals. Toxigenic fungi often grow on edible plants, thus contaminating food and feed. Plants, as living organisms, can alter the chemical structure of mycotoxins as part of their defence against xenobiotics. The extractable conjugated or non-extractable bound mycotoxins formed remain present in the plant tissue but are currently neither routinely screened for in food nor regulated by legislation, thus they may be considered masked. Fusarium mycotoxins (deoxynivalenol, zearalenone, fumonisins, nivalenol, fusarenon-X, T-2 toxin, HT-2 toxin, fusaric acid) are prone to metabolisation or binding by plants, but transformation of other mycotoxins by plants (ochratoxin A, patulin, destruxins) has also been described. Toxicological data are scarce, but several studies highlight the potential threat to consumer safety from these substances. In particular, the possible hydrolysis of masked mycotoxins back to their toxic parents during mammalian digestion raises concerns. Dedicated chapters of this article address plant metabolism as well as the occurrence of masked mycotoxins in food, analytical aspects for their determination, toxicology and their impact on stakeholders. PMID:23047235

  20. Zirconia nanocrystals as submicron level biological label

    Science.gov (United States)

    Smits, K.; Liepins, J.; Gavare, M.; Patmalnieks, A.; Gruduls, A.; Jankovica, D.

    2012-08-01

    Inorganic nanocrystals are of increasing interest for their usage in biology and pharmacology research. Our interest was to justify ZrO2 nanocrystal usage as submicron level biological label in baker's yeast Saccharomyces cerevisia culture. For the first time (to our knowledge) images with sub micro up-conversion luminescent particles in biologic media were made. A set of undoped as well as Er and Yb doped ZrO2 samples at different concentrations were prepared by sol-gel method. The up-conversion luminescence for free standing and for nanocrystals with baker's yeast cells was studied and the differences in up-conversion luminescence spectra were analyzed. In vivo toxic effects of ZrO2 nanocrystals were tested by co-cultivation with baker's yeast.

  1. Do nanofill or submicron composites show improved smoothness and gloss? A systematic review of in vitro studies

    NARCIS (Netherlands)

    Kaizer, M.R.; Oliveira-Ogliari, A. de; Cenci, M.S.; Opdam, N.J.M.; Moraes, R.R.

    2014-01-01

    OBJECTIVES: Despite nanofill and submicron composites' aim to provide high initial polishing combined with superior smoothness and gloss retention, the question still remains whether clinicians should consider using these new materials over traditional microhybrids. The aim of this paper was to

  2. Binary Masking & Speech Intelligibility

    OpenAIRE

    Boldt, Jesper

    2010-01-01

    The purpose of this thesis is to examine how binary masking can be used to increase intelligibility in situations where hearing impaired listeners have difficulties understanding what is being said. The major part of the experiments carried out in this thesis can be categorized as either experiments under ideal conditions or as experiments under more realistic conditions useful for real-life applications such as hearing aids. In the experiments under ideal conditions, the previously defined i...

  3. Masking and manipulation.

    Science.gov (United States)

    Ventura, Rosa; Segura, Jordi

    2010-01-01

    The list of prohibited substances in sports includes a group of masking agents that are forbidden in both in- and out-of-competition doping tests. This group consists of a series of compounds that are misused in sports to mask the administration of other doping agents, and includes: diuretics, used to reduce the concentration in urine of other doping agents either by increasing the urine volume or by reducing the excretion of basic doping agents by increasing the urinary pH; probenecid, used to reduce the concentration in urine of acidic compounds, such as glucuronoconjugates of some doping agents; 5alpha-reductase inhibitors, used to reduce the formation of 5alpha-reduced metabolites of anabolic androgenic steroids; plasma expanders, used to maintain the plasma volume after misuse of erythropoietin or red blood cells concentrates; and epitestosterone, used to mask the detection of the administration of testosterone. Diuretics may be also misused to achieve acute weight loss before competition in sports with weight categories. In this chapter, pharmacological modes of action, intended pharmacological effects for doping purposes, main routes of biotransformation and analytical procedures used for anti-doping controls to screen and confirm these substances will be reviewed and discussed.

  4. Synthesis of Submicron Hexagonal Plate-Type SnS2 and Band Gap-Tuned Sn1−xTixS2 Materials and Their Hydrogen Production Abilities on Methanol/Water Photosplitting

    Directory of Open Access Journals (Sweden)

    Kang Min Kim

    2014-01-01

    Full Text Available SnS2 and Sn1−xTixS2 (x = 0, 0.1, 0.3, 0.5, and 0.7 mol materials were designed using solvothermal method with the aim to enhance hydrogen production from water/methanol water photosplitting. Scanning electron microscopy revealed hexagonal plates with one side, 3.0 μm in length, in the SnS2 materials. Pure SnS2 showed absorption band edges of above 660 nm, and the absorption was shifted to low wavelengths with the insertion of Ti ions. The evolution of H2 from MeOH/H2O (1 : 1 photosplitting over SnS2 hexagonal plates in the photocatalytic liquid system was 0.016 mL h−1 g−1, and the evolutions were enhanced in Sn1−xTixS2. In particular, 0.049 mL h−1 g−1 of H2 gas was produced in Sn0.7Ti0.3S2 without electrolytes and it increased significantly to more than 90.6% (0.47 mL h−1 g−1 evolutions at higher pH using 0.1 M of KOH. Based on the UV-visible absorption spectra, the high photocatalytic activity of Sn1−xTixS2 was attributed to the existence of an appropriate band-gap state that retarded recombination between the electrons and holes.

  5. Submicron Emulsions and Their Applications in Oral Delivery.

    Science.gov (United States)

    Mundada, Veenu; Patel, Mitali; Sawant, Krutika

    2016-01-01

    A "submicron emulsion" is an isotropic mixture of drug, lipids, and surfactants, usually with hydrophilic cosolvents and with droplet diameters ranging from 10 to 500 nm. Submicron emulsions are of increasing interest in medicine due to their kinetic stability, high solubilizing capacity, and tiny globule size. Because of these properties, they have been applied in various fields, such as personal care, cosmetics, health care, pharmaceuticals, and agrochemicals. Submicron emulsions are by far the most advanced nanoparticulate systems for the systemic delivery of biologically active agents for controlled drug delivery and targeting. They are designed mainly for pharmaceutical formulations suitable for various routes of administration like parenteral, ocular, transdermal, and oral. This review article describes the marked potential of submicron emulsions for oral drug delivery owing to their numerous advantages like reduced first pass metabolism, inhibition of P-glycoprotein efflux system, and enhanced absorption via intestinal lymphatic pathway. To overcome the limitations of liquid dosage forms, submicron emulsions can be formulated into solid dosage forms such as solid self-emulsifying systems. This article covers various types of submicron emulsions like microemulsion, nanoemulsion, and self-emulsifying drug delivery system (SEDDS), and their potential pharmaceutical applications in oral delivery with emphasis on their advantages, limitations, and advancements.

  6. Chemical mapping of proterozoic organic matter at submicron spatial resolution.

    Science.gov (United States)

    Oehler, Dorothy Z; Robert, François; Mostefaoui, Smail; Meibom, Anders; Selo, Madeleine; McKay, David S

    2006-12-01

    A NanoSIMS ion microprobe was used to map the submicron-scale distributions of carbon, nitrogen, sulfur, silicon, and oxygen in organic microfossils and laminae in a thin section of the approximately 0.85 billion year old Bitter Springs Formation of Australia. The data provide clues about the original chemistry of the microfossils, the silicification process, and the biosignatures of specific microorganisms and microbial communities. Chemical maps of fossil unicells and filaments revealed distinct wall- and sheath-like structures enriched in C, N, and S, consistent with their accepted biological origin. Surprisingly, organic laminae, previously considered to be amorphous, also exhibited filamentous and apparently compressed spheroidal structures defined by strong enrichments in C, N, and S. By analogy to NanoSIMS data from the well-preserved microfossils, these structures were interpreted as being of biological origin, most likely representing densely packed remnants of microbial mats. Given that the preponderance of organic matter in Precambrian sediments is similarly "amorphous," our findings indicate that a re-evaluation of ancient specimens via in situ structural, chemical, and isotopic study is warranted. Our analyses have led us to propose new criteria for assessing the biogenicity of problematic kerogenous materials, and, thus, these criteria can be applied to assessments of poorly preserved or fragmentary organic residues in early Archean sediments and any that might occur in meteorites or other extraterrestrial samples.

  7. Distribution Manner of Compaction Circular Cylinders in Through-Active-Mask Electrochemical Machining

    Directory of Open Access Journals (Sweden)

    Hansong Li

    2015-02-01

    Full Text Available Electrochemical machining is widely used in the processing of difficult-to-machine metal materials. And through-mask electrochemical machining is a very important technology in the processing array structure of difficult-to-cut metal materials. Traditional through-mask electrochemical machining always uses a photoresist as the mask. The production process of a mask is complicated, and the mask cannot be reused. In this paper, through-active-mask electrochemical machining to process array structure in difficult-to-machine metal materials was investigated. Compared with traditional electrochemical machining masks, a copper-clad laminate is used to make the mask by mechanical machining in through-active-mask electrochemical machining. Also, the mask does not stick together with the workpiece but covers the workpiece by mechanical compaction, so the mask can be reused. In order to ensure the mask is in close contact with the workpiece, we need to arrange many compaction circular cylinders within the flow channel. The influences on electrolyte flow of compaction circular cylinders were investigated. The distribution of the compaction circular cylinders affects the electrolyte flow state, thereby affecting the processing. By analyzing the electrolyte flow state for the different distributions of compaction circular cylinders, one can find the best distribution of compaction circular cylinders for the required processing.

  8. Akathisia masked by hypokinesia.

    Science.gov (United States)

    Tuisku, K; Lauerma, H; Holi, M M; Honkonen, T; Rimon, R

    2000-07-01

    Here, we will discuss the concept of subjective akathisia and present a patient case. Our patient was suffering from neuroleptic-induced hypokinesia and akathisia at the same time. The typical motor manifestations of akathisia were masked by hypokinesia, which made the diagnosis difficult. However, the subjective symptoms of akathisia were evident and distressing. Although not observable to bare eye, the pathognomonic pattern of motor activity detected in akathisia was demonstrated by actometric recording. Changing the conventional neuroleptic to an atypical one brought relief to the subjective symptoms of akathisia and hypokinesia, while the motor activity was clearly diminished in actometric recording. Actometric recording may be useful in diagnosing akathisia masked by hypokinesia, but the typical subjective symptoms of akathisia should not be ignored, even when actometry is not available to demonstrate the missing motor component of akathisia. Not only akathisia defined by DSM-IV but also subjective akathisia should be adequately treated to relieve the subjective distress, and to diminish the unfavorable effects on psychotic symptoms, behavior, and drug compliance.

  9. New performance data for {open_quotes}Emery 3002{close_quotes} and {open_quotes}Emery 3004,{close_quotes} two Army-approved safe materials to replace DOP in mask and filter testing

    Energy Technology Data Exchange (ETDEWEB)

    Carlon, H.R.; Guelta, M.A. [Army Edgewood Research, Development and Engineering Center, Aberdeen Proving Ground, MD (United States)

    1995-02-01

    At the 22nd Conference in Denver, we reported that the U.S. Army Surgeon General (SGJ) had approved our developmental material {open_quotes}Emery 3004{close_quotes} as a safe replacement for the suspected carcinogen DOP (dioctyl phthalate) in mask and filter testing throughout the Army. Subsequently the SG approved a second, less viscous material, {open_quotes}Emery 3002,{close_quotes} for similar applications. We have measured the viscosities and surface tensions of these liquids over a wide range of temperatures, and have initiated liquid breakup studies through Laskin and two-fluid nozzles. New measurements have been carried out with both liquids, e.g. using the ATI, Inc., TDA-4A cold generator to disperse aerosols for which droplet size distributions were measured using the TSI, Inc., Differential Mobility Particle Sizer (DMPS). Among the findings were that Emery 3004 performs much like DOP in the TDA-4A, with some possible advantages, while Emery 3002 in the TDA-4A produces mean droplet diameters about one-half those of Emery 3004 or DOP. This suggests that Emery 3002 could yield more rigorous filter tests with a smaller consumption of material. New laboratory results will be summarized. Sources of the {open_quotes}Emery{close_quotes} materials will be discussed since the production facility formerly operated by Emery is now run by the Ethyl Corporation and the source products are now known as {open_quotes}Ethylflo 192{close_quotes} (Emery 3002) and{open_quotes}Ethylflo 194{close_quotes} (Emery 3004).

  10. Production of SCALPEL masks in a commercial mask facility

    Science.gov (United States)

    Newport, Chris L.; Parker, Jeffrey; Smith, K. M.; Benveniste, Albert; Kim, Nam-Wook; Reyland, David; Farrow, Reginald C.; Novembre, Anthony E.; Kasica, Richard J.; Knurek, Chester S.; Peabody, Milton L., Jr.; Rutberg, Len

    1999-06-01

    The purpose of this paper is to investigate the viability of fabricating SCALPEL masks at a DuPont Photomasks, Inc. commercial mask shop. The MEBES 4500 electron beam exposure system and standard inspection tools were used in SCALPEL manufacture to study the key issues to be overcome and the key components needed to succeed in large-scale manufacture. SCALPEL is a next generation lithography technology being researched and developed at Lucent Technologies as the semiconductor industry moves beyond optical lithography. The SCALPEL tool uses a membrane-type mask for high-resolution patterning on Si wafers. SCALPEL mask manufacturing present new and challenging operations in a commercial mask production facility. The production sequence of SCALPEL masks is not uncommon to the current Cr/Qz environment, but introduces the commercial facility to issues at a different level. SCALPEL mask exposure has been accomplished using MEBES III and an advanced MEBES 4500 e-beam lithography system. Pattern imaging, CD metrology, defect inspection, registration metrology, mask handling, and cleaning operations have been attempted with various levels of success. Data and further development of the processes in the commercial facility, along with the challenges and results of these experiences, are detailed in this presentation.

  11. SEMATECH EUVL mask program status

    Science.gov (United States)

    Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

    2009-04-01

    As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been

  12. Masked hypertension in diabetes mellitus

    DEFF Research Database (Denmark)

    Franklin, Stanley S; Thijs, Lutgarde; Li, Yan

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood...... Pressure in Relation to Cardiovascular Outcomes. Prevalence of masked hypertension in untreated normotensive participants was higher (P...

  13. Masked Repetition Priming Using Magnetoencephalography

    Science.gov (United States)

    Monahan, Philip J.; Fiorentino, Robert; Poeppel, David

    2008-01-01

    Masked priming is used in psycholinguistic studies to assess questions about lexical access and representation. We present two masked priming experiments using MEG. If the MEG signal elicited by words reflects specific aspects of lexical retrieval, then one expects to identify specific neural correlates of retrieval that are sensitive to priming.…

  14. Electrospun submicron bioactive glass fibers for bone tissue scaffold.

    Science.gov (United States)

    Lu, H; Zhang, T; Wang, X P; Fang, Q F

    2009-03-01

    Submicron bioactive glass fibers 70S30C (70 mol% SiO(2), 30 mol% CaO) acting as bone tissue scaffolds were fabricated by electrospinning method. The scaffold is a hierarchical pore network that consists of interconnected fibers with macropores and mesopores. The structure, morphological characterization and mechanical properties of the submicron bioactive glass fibers were studied by XRD, EDS, FIIR, SEM, N(2) gas absorption analyses and nanoindentation. The effect of the voltage on the morphology of electrospun bioactive glass fibers was investigated. It was found that decreasing the applied voltage from 19 to 7 kV can facilitate the formation of finer fibers with fewer bead defects. The hardness and Young's modulus of submicron bioactive glass fibers were measured as 0.21 and 5.5 GPa, respectively. Comparing with other bone tissue scaffolds measured by nanoindentation, the elastic modulus of the present scaffold was relatively high and close to the bone.

  15. Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

    Science.gov (United States)

    Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart

    2011-03-01

    Extreme Ultraviolet Lithography (EUVL) is considered the leading lithography technology choice for semiconductor devices at 16nm HP node and beyond. However, before EUV Lithography can enter into High Volume Manufacturing (HVM) of advanced semiconductor devices, the ability to guarantee mask integrity at point-of-exposure must be established. Highly efficient, damage free mask cleaning plays a critical role during the mask manufacturing cycle and throughout the life of the mask, where the absence of a pellicle to protect the EUV mask increases the risk of contamination during storage, handling and use. In this paper, we will present effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance, which employs an intelligent, holistic approach to maximize Mean Time Between Cleans (MBTC) and extend the useful life span of the reticle. The data presented will demonstrate the protection of the capping and absorber layers, preservation of pattern integrity as well as optical and mechanical properties to avoid unpredictable CD-linewidth and overlay shifts. Experiments were performed on EUV blanks and pattern masks using various process conditions. Conditions showing high particle removal efficiency (PRE) and minimum surface layer impact were then selected for durability studies. Surface layer impact was evaluated over multiple cleaning cycles by means of UV reflectivity metrology XPS analysis and wafer prints. Experimental results were compared to computational models. Mask life time predictions where made using the same computational models. The paper will provide a generic overview of the cleaning sequence which yielded best results, but will also provide recommendations for an efficient in-fab mask maintenance scheme, addressing handling, storage, cleaning and inspection.

  16. EUV mask manufacturing readiness in the merchant mask industry

    Science.gov (United States)

    Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

    2017-10-01

    As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for

  17. Submicron and nano formulations of titanium dioxide and zinc oxide stimulate unique cellular toxicological responses in the green microalga Chlamydomonas reinhardtii

    Energy Technology Data Exchange (ETDEWEB)

    Gunawan, Cindy, E-mail: c.gunawan@unsw.edu.au [ARC Centre of Excellence for Functional Nanomaterials, School of Chemical Engineering, The University of New South Wales, Sydney, NSW (Australia); Sirimanoonphan, Aunchisa [ARC Centre of Excellence for Functional Nanomaterials, School of Chemical Engineering, The University of New South Wales, Sydney, NSW (Australia); Teoh, Wey Yang [Clean Energy and Nanotechnology (CLEAN) Laboratory, School of Energy and Environment, City University of Hong Kong, Kowloon, Hong Kong Special Administrative Region (Hong Kong); Marquis, Christopher P., E-mail: c.marquis@unsw.edu.au [School of Biotechnology and Biomolecular Sciences, The University of New South Wales, Sydney, NSW (Australia); Amal, Rose [ARC Centre of Excellence for Functional Nanomaterials, School of Chemical Engineering, The University of New South Wales, Sydney, NSW (Australia)

    2013-09-15

    Highlights: • Uptake of TiO{sub 2} solids by C. reinhardtii generates ROS as an early stress response. • Submicron and nanoTiO{sub 2} exhibit benign effect on cell proliferation. • Uptake of ZnO solids and leached zinc by C. reinhardtii inhibit the alga growth. • No cellular oxidative stress is detected with submicron and nano ZnO exposure. • The toxicity of particles is not necessarily mediated by cellular oxidative stress. -- Abstract: The work investigates the eco-cytoxicity of submicron and nano TiO{sub 2} and ZnO, arising from the unique interactions of freshwater microalga Chlamydomonas reinhardtii to soluble and undissolved components of the metal oxides. In a freshwater medium, submicron and nano TiO{sub 2} exist as suspended aggregates with no-observable leaching. Submicron and nano ZnO undergo comparable concentration-dependent fractional leaching, and exist as dissolved zinc and aggregates of undissolved ZnO. Cellular internalisation of solid TiO{sub 2} stimulates cellular ROS generation as an early stress response. The cellular redox imbalance was observed for both submicron and nano TiO{sub 2} exposure, despite exhibiting benign effects on the alga proliferation (8-day EC50 > 100 mg TiO{sub 2}/L). Parallel exposure of C. reinhardtii to submicron and nano ZnO saw cellular uptake of both the leached zinc and solid ZnO and resulting in inhibition of the alga growth (8-day EC50 ≥ 0.01 mg ZnO/L). Despite the sensitivity, no zinc-induced cellular ROS generation was detected, even at 100 mg ZnO/L exposure. Taken together, the observations confront the generally accepted paradigm of cellular oxidative stress-mediated cytotoxicity of particles. The knowledge of speciation of particles and the corresponding stimulation of unique cellular responses and cytotoxicity is vital for assessment of the environmental implications of these materials.

  18. An introduction to deep submicron CMOS for vertex applications

    CERN Document Server

    Campbell, M; Cantatore, E; Faccio, F; Heijne, Erik H M; Jarron, P; Santiard, Jean-Claude; Snoeys, W; Wyllie, K

    2001-01-01

    Microelectronics has become a key enabling technology in the development of tracking detectors for High Energy Physics. Deep submicron CMOS is likely to be extensively used in all future tracking systems. Radiation tolerance in the Mrad region has been achieved and complete readout chips comprising many millions of transistors now exist. The choice of technology is dictated by market forces but the adoption of deep submicron CMOS for tracking applications still poses some challenges. The techniques used are reviewed and some of the future challenges are discussed.

  19. Sub-micron Cu/SSZ-13: Synthesis and application as selective catalytic reduction (SCR) catalysts

    Energy Technology Data Exchange (ETDEWEB)

    Prodinger, Sebastian; Derewinski, Miroslaw A.; Wang, Yilin; Washton, Nancy M.; Walter, Eric D.; Szanyi, János; Gao, Feng; Wang, Yong; Peden, Charles H. F.

    2017-02-01

    For the first time, sub-micron Cu/SSZ-13, obtained by modifying an existing synthesis procedure, was shown to be an effective and stable catalyst for selective catalytic reduction reactions, such as NO reduction. Characterization of the materials with X-ray diffraction, N2-physisorption and 27Al MAS NMR shows that hydrothermal aging, simulating SCR reaction conditions, is more destructive in respect to dealumination for smaller particles prior to Cu-exchange. However, the catalytic performance and hydrothermal stability for Cu/SSZ-13 is independent of the particle size. In particular, the stability of tetrahedral framework Al is improved in the sub-micron Cu/SSZ-13 catalysts of comparable Cu loading. This indicates that variations in the Al distribution for different SSZ-13 synthesis procedures have a more critical influence on stabilizing isolated Cu-ions during harsh hydrothermal aging than the particle size. This study is of high interest for applications in vehicular DeNOx technologies where high loadings of active species on wash coats can be achieved by using sub-micron Cu/SSZ-13. The authors would like to thank B. W. Arey and J. J. Ditto for performing electron microscope imaging. The authors gratefully acknowledge the US Department of Energy (DOE), Energy Efficiency and Renewable Energy, Vehicle Technologies Office for the support of this work. S. P and M. A. D also acknowledge support by the Materials Synthesis and Simulation Across Scales (MS3 Initiative) conducted under the Laboratory Directed Research & Development Program at PNNL. The research described in this paper was performed in the Environmental Molecular Sciences Laboratory (EMSL), a national scientific user facility sponsored by the DOE’s Office of Biological and Environmental Research and located at Pacific Northwest National Laboratory (PNNL). PNNL is operated for the US DOE by Battelle.

  20. Bloch-Wave Engineered Submicron Diameter Micropillars with Quality Factors Exceeding 10,000

    DEFF Research Database (Denmark)

    Hofling, S.; Lermer, M.; Gregersen, Niels

    2011-01-01

    Adiabatic design submicron diameter quantum-dot micropillars have been designed and implemented for cavity quantum electrodynamics experiments. Ultra-high experimental quality factors (>10,000) are obtained for submicron diameters and strong light-matter interaction is observed.......Adiabatic design submicron diameter quantum-dot micropillars have been designed and implemented for cavity quantum electrodynamics experiments. Ultra-high experimental quality factors (>10,000) are obtained for submicron diameters and strong light-matter interaction is observed....

  1. Hg-Mask Coronagraph

    Science.gov (United States)

    Bourget, P.; Veiga, C. H.; Vieira Martins, R.; Assus, P.; Colas, F.

    In order to optimize the occulting process of a Lyot coronagraph and to provide a high dynamic range imaging, a new kind of occulting disk has been developed at the National Observatory of Rio de Janeiro. A mercury (Hg) drop glued onto an optical window by molecular cohesion and compressed by a pellicle film is used as the occulting disk. The minimum of the superficial tension potential function provides an optical precision (lambda/100) of the toric free surface of the mercury. This process provides a size control for the adaptation to the seeing conditions and to the apparent diameter of a resolved object, and in the case of adaptive optics, to the Airy diameter fraction needed. The occultation is a three dimensional process near the focal plane on the toric free surface that provides an apodization of the occultation. The Hg-Mask coronagraph has been projected for astrometric observations of faint satellites near to Jovian planets and works since 2000 at the 1.6 m telescope of the Pico dos Dias Observatory (OPD - Brazil).

  2. UV Light–Induced Aggregation of Titania Submicron Particles

    Directory of Open Access Journals (Sweden)

    Can Zhou

    2016-11-01

    Full Text Available In this study, aggregation of TiO2 (rutile and anatase submicron particles in deionized (DI water under ultra-violet (UV light irradiation was investigated. While no aggregation was observed in the dark, rutile and anatase submicron particles started aggregating upon application of UV light and ceased aggregation in about 2 and 8.4 h, respectively. It has been demonstrated that UV light directly mitigated the particle mobility of TiO2, resulting in a neutralization effect of the Zeta potential. It was also observed that rutile particles aggregated much faster than anatase particles under UV radiation, indicating that the Zeta potential of as-prepared rutile is less than that of anatase in deionized (DI water. In addition, the interaction energy of rutile and anatase particles was simulated using the Derjaguin–Landau–Verwey–Overbeek (DLVO model. The results showed a significant reduction of barrier energy from 118.2 kBT to 33.6 kBT for rutile and from 333.5 kBT to 46.1 kBT for anatase, respectively, which further validated the remarkable influence of UV irradiation on the aggregation kinetics of rutile and anatase submicron particles. This work presents a further understanding of the aggregation mechanism of light-controlled submicron particles and has a promising potential application in environmental remediation.

  3. Submicron particle chemistry: Vapor condensation analogous to liquid solidification

    Science.gov (United States)

    Jenkins, Neil T.; Eagar, Thomas W.

    2003-06-01

    The chemical composition of submicron particles condensed from vapor can vary with particle size. This chemical variation with size affects industrial health estimates and technological innovation. A model based on similar behavior during the solidification of liquids is proposed to explain this behavior.

  4. Deep-submicron CMOS Single Photon Detectors and Quantum Effects

    NARCIS (Netherlands)

    Karami, M.A.

    2011-01-01

    Quantum parasitic effects and miniaturization of Single Photon Avalanche Diodes in deep-submicron technologies have been studied in this thesis in detail. Tunneling noise and Random Telegraph Signal (RTS) noise have been the main two parasitic effects addressed comprehensively. While the fundamental

  5. Cosmic Masks Still Dance

    Science.gov (United States)

    Block, David L.; Puerari, Ivânio; Frogel, Jay A.; Eskridge, Paul B.; Stockton, Alan; Fuchs, Burkhard

    The Hubble classification scheme of galaxies is based on their optical appearance or `masks'. As one goes from early to late type spirals, both barred and unbarred, the optical appearance will be dominated more and more by the young Population I, i.e., blue stars and dust. Atlases reveal the rich variety of responses of the Population I component of gas and dust (the mask) to the underlying, older, stellar population. However, the gaseous Population I component, may only constitute 5 percent of the dynamical mass of the galaxy. Masks of negligible mass may conceal the human face - and that of galaxy. In the near-infrared, the morphology of older star-dominated disk indicates a simple classification scheme: the dominant Fourier m-mode in the dust penetrated regime, and the associated pitch angle. A ubiquity of low m=1 and m=2 modes is confirmed. On the basis of deprojected H (1.65 μm) and K' (2.1μm) images, we propose that the evolved stellar disks may be grouped into three principal dust penetrated archetypes: those with tightly wound stellar arms characterised by pitch angles at K' of ~ 10^° (the α class), an intermediate group with pitch angles of ~ 25^° (the β class) and thirdly, those with open spirals demarcated by pitch angles at K' of ~ 40^° (the γ bin). Flat or falling rotation curves give rise to the tightly wound α class; rising rotation curves are associated with the open γ class. The observed dust penetrated classes are inextricably related to the rate of shear in the stellar disk, as determined by A/ω. Here A is the first Oort constant andω denotes the angular velocity. There is no correlation between our dust penetrated classes and optical Hubble binning; the Hubble tuning fork does not constrain the morphology of the old stellar Population II disks. NGC 3223 and NGC 7083 (both SbI-II and almost the same absolute blue magnitude) have identical Hubble types and identical luminosity classes; the dust penetrated disk of NGC 3223 has tightly

  6. Masking properties of ceramics for veneer restorations.

    Science.gov (United States)

    Skyllouriotis, Andreas L; Yamamoto, Hideo L; Nathanson, Dan

    2017-10-01

    The translucency and opacity of ceramics play a significant role in emulating the natural color of teeth, but studies of the masking properties and limitations of dental ceramics when used as monolayer restorations are lacking. The purpose of this in vitro study was to determine the translucency of 6 materials used for veneer restorations by assessing their translucency parameters (TPs), contrast ratios (CRs), and potential to mask dark tooth colors. Ten square- or disk-shaped specimens (0.5-mm thickness, shade A2) were fabricated from Vitablocks Mark II (VMII; Vita Zahnfabrik), IPS e.max CAD LT (EMXC LT; Ivoclar Vivadent AG), IPS e.max CAD HT (EMXC HT; Ivoclar Vivadent AG), IPS Empress CAD LT (EMP LT; Ivoclar Vivadent AG), IPS e.max Press LT (EMXP LT; Ivoclar Vivadent AG), and CZR (CZR; Kuraray Noritake Dental Inc). Their luminance (Y) values over black and over white tiles were measured, followed by their color (CIELab) over black tiles and white tiles and shaded A2 (control group), A3.5, A4, and B4 acrylic resin blocks. All measurements were performed using a spectrophotometer in 2 different areas on each specimen. Then CRs, TPs, and color differences (over shaded backgrounds) were determined. Data were subjected to 1-way and 2-way ANOVA (α=.05) for analysis. Mean CR values of EMXP LT were significantly higher than those of the other tested materials, whereas VMII and EMXC HT had the lowest values (Pceramic materials, whereas shade B4 demonstrated the lowest mean background effect (Ptranslucency among the tested ceramics were revealed (Ptranslucent under the conditions of this study (Pceramics exhibited poor masking properties against the A4 background. The color differences of most tested ceramics were more acceptable when tested against the B4 background (ΔE*≤3.3). Copyright © 2016 Editorial Council for the Journal of Prosthetic Dentistry. Published by Elsevier Inc. All rights reserved.

  7. Fluoropolymer materials and architectures prepared by controlled radical polymerizations

    DEFF Research Database (Denmark)

    Hansen, Natanya Majbritt Louie; Jankova Atanasova, Katja; Hvilsted, Søren

    2007-01-01

    properties and functionalities that can be obtained from these novel fluorinated materials and architectures are especially emphasized. Thus, various amphiphilic, biocompatible or low energy materials, fluorinated nanoparticles and nanoporous films/membranes as well as materials for submicron and nanolevel...

  8. Bubble masks for time-encoded imaging of fast neutrons.

    Energy Technology Data Exchange (ETDEWEB)

    Brubaker, Erik; Brennan, James S.; Marleau, Peter; Nowack, Aaron B.; Steele, John T.; Sweany, Melinda; Throckmorton, Daniel J.

    2013-09-01

    Time-encoded imaging is an approach to directional radiation detection that is being developed at SNL with a focus on fast neutron directional detection. In this technique, a time modulation of a detected neutron signal is inducedtypically, a moving mask that attenuates neutrons with a time structure that depends on the source position. An important challenge in time-encoded imaging is to develop high-resolution two-dimensional imaging capabilities; building a mechanically moving high-resolution mask presents challenges both theoretical and technical. We have investigated an alternative to mechanical masks that replaces the solid mask with a liquid such as mineral oil. Instead of fixed blocks of solid material that move in pre-defined patterns, the oil is contained in tubing structures, and carefully introduced air gapsbubblespropagate through the tubing, generating moving patterns of oil mask elements and air apertures. Compared to current moving-mask techniques, the bubble mask is simple, since mechanical motion is replaced by gravity-driven bubble propagation; it is flexible, since arbitrary bubble patterns can be generated by a software-controlled valve actuator; and it is potentially high performance, since the tubing and bubble size can be tuned for high-resolution imaging requirements. We have built and tested various single-tube mask elements, and will present results on bubble introduction and propagation as a function of tubing size and cross-sectional shape; real-time bubble position tracking; neutron source imaging tests; and reconstruction techniques demonstrated on simple test data as well as a simulated full detector system.

  9. Preparation of superhard cubic boron nitride sintered from commercially available submicron powders

    Science.gov (United States)

    Liu, Teng; Kou, Zili; Lu, Jingrui; Yan, Xiaozhi; Liu, Fangming; Li, Xin; Ding, Wei; Liu, Jin; Zhang, Qiang; Wang, Qiang; Ma, Dejiang; Lei, Li; He, Duanwei

    2017-03-01

    Using submicron cubic boron nitride (cBN) powder as a starting material, polycrystalline cBN (PcBN) samples without additives were sintered from 8.0-14.0 GPa at 1750 °C, and their sintering behaviour and mechanical properties were investigated. Transmission electron microscopy analysis showed that high-density nanotwins could be generated from common submicron cBN grains during high pressure and high temperature treatment. The dislocation glide and (111) mechanical micro-twinning are the main mechanisms that underlie plastic deformation in the sintering process, and this contributes to the grain refinement. A refinement in the grain size (˜120 nm), micro-defect (nanotwin and stacking faults), and strong covalent bonding between the grains are crucial for improving the sample mechanical properties. The PcBN sintered at 11.0 GPa/1750 °C possessed outstanding mechanical properties, including a high Vickers hardness (˜72 GPa), fracture toughness (˜12.4 MPam1/2), and thermal stability (˜1273 °C in air).

  10. Single Mode ZnO Whispering-Gallery Submicron Cavity and Graphene Improved Lasing Performance.

    Science.gov (United States)

    Li, Jitao; Lin, Yi; Lu, Junfeng; Xu, Chunxiang; Wang, Yueyue; Shi, Zengliang; Dai, Jun

    2015-07-28

    Single-mode ultraviolet (UV) laser of ZnO is still in challenge so far, although it has been paid great attention along the past decades. In this work, single-mode lasing resonance was realized in a submicron-sized ZnO rod based on serially varying the dimension of the whispering-gallery mode (WGM) cavities. The lasing performance, such as the lasing quality factor (Q) and the lasing intensity, was remarkably improved by facilely covering monolayer graphene on the ZnO submicron-rod. The mode structure evolution from multimodes to single-mode was investigated systematically based on the total internal-wall reflection of the ZnO microcavities. Graphene-induced optical field confinement and lasing emission enhancement were revealed, indicating an energy coupling between graphene SP and ZnO exciton emission. This result demonstrated the response of graphene in the UV wavelength region and extended its potential applications besides many previous reports on the multifunctional graphene/semiconductor hybrid materials and devices in advanced electronics and optoelectronics areas.

  11. Submicron polycaprolactone particles as a carrier for imaging contrast agent for in vitro applications.

    Science.gov (United States)

    Iqbal, Muhammad; Robin, Sophie; Humbert, Philippe; Viennet, Céline; Agusti, Geraldine; Fessi, Hatem; Elaissari, Abdelhamid

    2015-12-01

    Fluorescent materials have recently attracted considerable attention due to their unique properties and high performance as imaging agent in biomedical fields. Different imaging agents have been encapsulated in order to restrict its delivery to a specific area. In this study, a fluorescent contrast agent was encapsulated for in vitro application by polycaprolactone (PCL) polymer. The encapsulation was performed using modified double emulsion solvent evaporation technique with sonication. Fluorescent nanoparticles (20 nm) were incorporated in the inner aqueous phase of double emulsion. A number of samples were fabricated using different concentrations of fluorescent contrast agent. The contrast agent-containing submicron particle was characterized by a zetasizer for average particle size, SEM and TEM for morphology observations and fluorescence spectrophotometer for encapsulation efficiency. Moreover, contrast agent distribution in the PCL matrix was determined by confocal microscopy. The incorporation of contrast agent in different concentrations did not affect the physicochemical properties of PCL particles and the average size of encapsulated particles was found to be in the submicron range. Copyright © 2015 Elsevier B.V. All rights reserved.

  12. Self-Rescue Mask Training

    CERN Document Server

    2013-01-01

    Nine new self-rescue mask instructors have been trained since early 2013, which provides CERN with a total of 26 self-rescue mask instructors to date. This will allow us to meet the increasing training needs caused by the Long Shut Down LS1.   The self-rescue mask instructors have trained 1650 persons in 2012 and about 500 persons since the beginning of the year on how to wear the masks properly. We thank all the instructors and all the persons that made this training possible. Please remember that the self-rescue masks training sessions are scheduled as follows: Basic course: Tuesday and Thursday mornings (2 sessions – 8.30 AM and 10.30 AM), duration:  1.30 hour, in French and English – registration via CERN online training catalogue – Course code 077Y00. Refresher training : Monday mornings (2 sessions – 8.30 AM and 10.30 AM), duration: 1.30 hour , in French and English – registration via CERN online training catalogue &...

  13. Deciphering sub-micron ice particles on Enceladus surface

    Science.gov (United States)

    Scipioni, F.; Schenk, P.; Tosi, F.; D'Aversa, E.; Clark, R.; Combe, J.-Ph.; Ore, C. M. Dalle

    2017-07-01

    The surface of Saturn's moon Enceladus is composed primarily by pure water ice. The Cassini spacecraft has observed present-day geologic activity at the moon's South Polar Region, related with the formation and feeding of Saturn's E-ring. Plumes of micron-sized particles, composed of water ice and other non-ice contaminants (e.g., CO2, NH3, CH4), erupt from four terrain's fractures named Tiger Stripes. Some of this material falls back on Enceladus' surface to form deposits that extend to the North at ∼40°W and ∼220°W, with the highest concentration found at the South Pole. In this work we analyzed VIMS-IR data to identify plumes deposits across Enceladus' surface through the variation in band depth of the main water ice spectral features. To characterize the global variation of water ice band depths across Enceladus, the entire surface was sampled with an angular resolution of 1° in both latitude and longitude, and for each angular bin we averaged the value of all spectral indices as retrieved by VIMS. The position of the plumes' deposits predicted by theoretical models display a good match with water ice band depths' maps on the trailing hemisphere, whereas they diverge significantly on the leading side. Space weathering processes acting on Enceladus' surface ionize and break up water ice molecules, resulting in the formation of particles smaller than one micron. We also mapped the spectral indices for sub-micron particles and we compared the results with the plumes deposits models. Again, a satisfactory match is observed on the trailing hemisphere only. Finally, we investigated the variation of the depth of the water ice absorption bands as a function of the phase angle. In the visible range, some terrains surrounding the Tiger Stripes show a decrease in albedo when the phase angle is smaller than 10°. This unusual effect cannot be confirmed by near infrared data, since observations with a phase angle lower than 10° are not available. For phase angle

  14. Changes of propagation light in optical fiber submicron wires

    Science.gov (United States)

    Stasiewicz, K. A.; Łukowski, A.; Jaroszewicz, L. R.

    2013-05-01

    At the moment technology allows to miniaturize measurement system to several micrometers. Application of an optical fiber taper in such system needs to manufacture a new one with diameters below single micrometers which is very difficult and expensive. Another way to obtain this level of diameters is the process of tapering from the existing fibers. In the paper, experimental results of propagation light from a supercontinnum sources of the wavelength generates the wavelength of 350-2000 nm, in different optical fiber submicron wires made from tapers manufactured from single mode fibers are presented. Biconical optical fibers' tapers were manufactured in low pressure gas burner technique. There are presented spectral characteristics of a propagated beam. For the test, there was manufactured an optical fiber submicron wires with a different length of waist region with a diameter near one micrometer. We put to the test a taper made from a standard telecommunication fiber SMF-28 with a cutoff wavelength equal to 1260.

  15. Energy Efficient Signaling in Deep-submicron Technology

    Directory of Open Access Journals (Sweden)

    Imed Ben Dhaou

    2002-01-01

    Full Text Available In deep-submicron technology, global interconnect capacitances have started reaching several orders of magnitude greater than the intrinsic capacitances of the CMOS gates. The dynamic power consumption of a CMOS gate driving a global wire is the sum of the power dissipated due to (discharging (i the intrinsic capacitance of the gate, and (ii the wire capacitance. The latter is referred to as on-chip signaling power consumption.

  16. Submicron Resolution Spectral-Domain Optical Coherence Tomography

    KAUST Repository

    Alarousu, Erkki

    2013-11-14

    Apparatuses and systems for submicron resolution spectral-domain optical coherence tomography (OCT) are disclosed. The system may use white light sources having wavelengths within 400-1000 nanometers, and achieve resolution below 1 .mu.m. The apparatus is aggregated into a unitary piece, and a user can connect the apparatus to a user provided controller and/or light source. The light source may be a supercontinuum source.

  17. Scanning SQUID susceptometers with sub-micron spatial resolution

    Energy Technology Data Exchange (ETDEWEB)

    Kirtley, John R., E-mail: jkirtley@stanford.edu; Rosenberg, Aaron J.; Palmstrom, Johanna C.; Holland, Connor M.; Moler, Kathryn A. [Department of Applied Physics, Stanford University, Stanford, California 94305-4045 (United States); Paulius, Lisa [Department of Physics, Western Michigan University, Kalamazoo, Michigan 49008-5252 (United States); Spanton, Eric M. [Department of Physics, Stanford University, Stanford, California 94305-4045 (United States); Schiessl, Daniel [Attocube Systems AG, Königinstraße 11A, 80539 Munich (Germany); Jermain, Colin L.; Gibbons, Jonathan [Department of Physics, Cornell University, Cornell, Ithaca, New York 14853 (United States); Fung, Y.-K.K.; Gibson, Gerald W. [IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598 (United States); Huber, Martin E. [Department of Physics, University of Colorado Denver, Denver, Colorado 80217-3364 (United States); Ralph, Daniel C. [Department of Physics, Cornell University, Cornell, Ithaca, New York 14853 (United States); Kavli Institute at Cornell, Ithaca, New York 14853 (United States); Ketchen, Mark B. [OcteVue, Hadley, Massachusetts 01035 (United States)

    2016-09-15

    Superconducting QUantum Interference Device (SQUID) microscopy has excellent magnetic field sensitivity, but suffers from modest spatial resolution when compared with other scanning probes. This spatial resolution is determined by both the size of the field sensitive area and the spacing between this area and the sample surface. In this paper we describe scanning SQUID susceptometers that achieve sub-micron spatial resolution while retaining a white noise floor flux sensitivity of ≈2μΦ{sub 0}/Hz{sup 1/2}. This high spatial resolution is accomplished by deep sub-micron feature sizes, well shielded pickup loops fabricated using a planarized process, and a deep etch step that minimizes the spacing between the sample surface and the SQUID pickup loop. We describe the design, modeling, fabrication, and testing of these sensors. Although sub-micron spatial resolution has been achieved previously in scanning SQUID sensors, our sensors not only achieve high spatial resolution but also have integrated modulation coils for flux feedback, integrated field coils for susceptibility measurements, and batch processing. They are therefore a generally applicable tool for imaging sample magnetization, currents, and susceptibilities with higher spatial resolution than previous susceptometers.

  18. Informational masking and musical training

    Science.gov (United States)

    Oxenham, Andrew J.; Fligor, Brian J.; Mason, Christine R.; Kidd, Gerald

    2003-09-01

    The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

  19. Masked Hypertension in Diabetes Mellitus

    Science.gov (United States)

    Franklin, Stanley S.; Thijs, Lutgarde; Li, Yan; Hansen, Tine W.; Boggia, José; Liu, Yanping; Asayama, Kei; Björklund-Bodegård, Kristina; Ohkubo, Takayoshi; Jeppesen, Jørgen; Torp-Pedersen, Christian; Dolan, Eamon; Kuznetsova, Tatiana; Stolarz-Skrzypek, Katarzyna; Tikhonoff, Valérie; Malyutina, Sofia; Casiglia, Edoardo; Nikitin, Yuri; Lind, Lars; Sandoya, Edgardo; Kawecka-Jaszcz, Kalina; Filipovský, Jan; Imai, Yutaka; Wang, Jiguang; Ibsen, Hans; O’Brien, Eoin; Staessen, Jan A.

    2013-01-01

    Although distinguishing features of masked hypertension in diabetics are well known, the significance of antihypertensive treatment on clinical practice decisions has not been fully explored. We analyzed 9691 subjects from the population-based 11-country International Database on Ambulatory Blood Pressure in Relation to Cardiovascular Outcomes. Prevalence of masked hypertension in untreated normotensive participants was higher (Phypertensives tended to be higher than in normotensives (hazard rate [HR], 1.96; 95% confidence interval [CI], 0.97–3.97; P=0.059), similar to untreated stage 1 hypertensives (HR, 1.07; CI, 0.58–1.98; P=0.82), but less than stage 2 hypertensives (HR, 0.53; CI, 0.29–0.99; P=0.048). In contrast, cardiovascular risk was not significantly different in antihypertensive-treated diabetic-masked hypertensives, as compared with the normotensive comparator group (HR, 1.13; CI, 0.54–2.35; P=0.75), stage 1 hypertensives (HR, 0.91; CI, 0.49–1.69; P=0.76), and stage 2 hypertensives (HR, 0.65; CI, 0.35–1.20; P=0.17). In the untreated diabetic-masked hypertensive population, mean conventional systolic/diastolic blood pressure was 129.2±8.0/76.0±7.3 mm Hg, and mean daytime systolic/diastolic blood pressure 141.5±9.1/83.7±6.5 mm Hg. In conclusion, masked hypertension occurred in 29% of untreated diabetics, had comparable cardiovascular risk as stage 1 hypertension, and would require considerable reduction in conventional blood pressure to reach daytime ambulatory treatment goal. Importantly, many hypertensive diabetics when receiving antihypertensive therapy can present with normalized conventional and elevated ambulatory blood pressure that mimics masked hypertension. PMID:23478096

  20. Production mask composition checking flow

    Science.gov (United States)

    Ma, Shou-Yuan; Yang, Chuen-Huei; Tsai, Joe; Wang, Alice; Lin, Roger; Lee, Rachel; Deng, Erwin; Lin, Ling-Chieh; Liao, Hung-Yueh; Tsai, Jenny; Bowhill, Amanda; Vu, Hien; Russell, Gordon

    2016-05-01

    The mask composition checking flow is an evolution of the traditional mask rule check (MRC). In order to differentiate the flow from MRC, we call it Mask Data Correctness Check (MDCC). The mask house does MRC only to identify process limitations including writing, etching, metrology, etc. There still exist many potential errors that could occur when the frame, main circuit and dummies all together form a whole reticle. The MDCC flow combines the design rule check (DRC) and MRC concepts to adapt to the complex patterns in today's wafer production technologies. Although photomask data has unique characteristics, the MRC tool in Calibre® MDP can easily achieve mask composition by using the Extended MEBES job deck (EJB) format. In EJB format, we can customize the combination of any input layers in an IC design layout format, such as OASIS. Calibre MDP provides section-based processing for many standard verification rule format (SVRF) commands that support DRC-like checks on mask data. Integrating DRC-like checking with EJB for layer composition, we actually perform reticle-level DRC, which is the essence of MDCC. The flow also provides an early review environment before the photomask pattern files are available. Furthermore, to incorporate the MDCC in our production flow, runtime is one of the most important indexes we consider. When the MDCC is included in the tape-out flow, the runtime impact is very limited. Calibre, with its multi-threaded processes and good scalability, is the key to achieving acceptable runtime. In this paper, we present real case runtime data for 28nm and 14nm technology nodes, and prove the practicability of placing MDCC into mass production.

  1. Holographically Encoded Volume Phase Masks

    Science.gov (United States)

    2015-07-13

    optics ,” Nat. Photonics 4, 188–193 (2010). 26. H. Kogelnik, “Coupled wave theory for thick volume holograms ,” Bell System Tech. J. 45(9), 2909–2944...phase masks Marc SeGall, Ivan Divliansky,* Clémence Jollivet, Axel Schülzgen, and Leonid B. Glebov University of Central Florida, College of Optics and...satisfying the Bragg condition of the hologram . Moreover, this approach enables the capability to encode and multiplex several phase masks into a single

  2. Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system

    Science.gov (United States)

    Phan, Khoi A.; Spence, Chris A.; Dakshina-Murthy, S.; Bala, Vidya; Williams, Alvina M.; Strener, Steve; Eandi, Richard D.; Li, Junling; Karklin, Linard

    1999-12-01

    As advanced process technologies in the wafer fabs push the patterning processes toward lower k1 factor for sub-wavelength resolution printing, reticles are required to use optical proximity correction (OPC) and phase-shifted mask (PSM) for resolution enhancement. For OPC/PSM mask technology, defect printability is one of the major concerns. Current reticle inspection tools available on the market sometimes are not capable of consistently differentiating between an OPC feature and a true random defect. Due to the process complexity and high cost associated with the making of OPC/PSM reticles, it is important for both mask shops and lithography engineers to understand the impact of different defect types and sizes to the printability. Aerial Image Measurement System (AIMS) has been used in the mask shops for a number of years for reticle applications such as aerial image simulation and transmission measurement of repaired defects. The Virtual Stepper System (VSS) provides an alternative method to do defect printability simulation and analysis using reticle images captured by an optical inspection or review system. In this paper, pre- programmed defects and repairs from a Defect Sensitivity Monitor (DSM) reticle with 200 nm minimum features (at 1x) will be studied for printability. The simulated resist lines by AIMS and VSS are both compared to SEM images of resist wafers qualitatively and quantitatively using CD verification.Process window comparison between unrepaired and repaired defects for both good and bad repair cases will be shown. The effect of mask repairs to resist pattern images for the binary mask case will be discussed. AIMS simulation was done at the International Sematech, Virtual stepper simulation at Zygo and resist wafers were processed at AMD-Submicron Development Center using a DUV lithographic process for 0.18 micrometer Logic process technology.

  3. Submicron particle mass concentrations and sources in the Amazonian wet season (AMAZE-08)

    Energy Technology Data Exchange (ETDEWEB)

    Chen, Q.; Farmer, D. K.; Rizzo, L. V.; Pauliqueivis, T.; Kuwata, Mikinori; Karl, Thomas G.; Guenther, Alex B.; Allan, James D.; Coe, H.; Andreae, M. O.; Poeschl, U.; Jiminez, J. L.; Artaxo, Paulo; Martin, Scot T.

    2015-01-01

    Real-time mass spectra of non-refractory component of submicron aerosol particles were recorded in a tropical rainforest in the central Amazon basin during the wet season of 2008, as a part of the Amazonian Aerosol Characterization Experiment (AMAZE-08). Organic components accounted on average for more than 80% of the non-refractory submicron particle mass concentrations during the period of measurements. Ammonium was present in sufficient quantities to halfway neutralize sulfate. In this acidic, isoprene-dominated, low-NOx environment the high-resolution mass spectra as well as mass closures with ion chromatography measurements did not provide evidence for significant contributions of organosulfate species, at least at concentrations above uncertainty levels. Positive-matrix factorization of the time series of particle mass spectra identified four statistical factors to account for the variance of the signal intensities of the organic constituents: a factor HOA having a hydrocarbon-like signature and identified as regional emissions of primary organic material, a factor OOA-1 associated with fresh production of secondary organic material by a mechanism of BVOC oxidation followed by gas-to-particle conversion, a factor OOA-2 consistent with reactive uptake of isoprene oxidation products, especially epoxydiols by acidic particles, and a factor OOA-3 associated with long range transport and atmospheric aging. The OOA-1, -2, and -3 factors had progressively more oxidized signatures. Diameter-resolved mass spectral markers also suggested enhanced reactive uptake of isoprene oxidation products to the accumulation mode for the OOA-2 factor, and such size partitioning can be indicative of in-cloud process. The campaign-average factor loadings were in a ratio of 1.1:1.0 for the OOA-1 compared to the OOA-2 pathway, suggesting the comparable importance of gas-phase compared to particle-phase (including cloud waters) production pathways of secondary organic material during

  4. EX 24 Full Face Mask

    Science.gov (United States)

    1993-05-01

    empirical testing of the system are reported in the next section. Conclusions of Human Factors Evaluation The two most commonly-reported shortcomings of...DIRT BLAME CONTEXTUAL GIFT JET NON-CONTEXTUAL BLOUSE BAR CONTEXTUAL SHELF SHOUT NON-CONTEXTUAL ZOO PAIN CONTEXTUAL MALE MAJOR NON-CONTEXTUAL D-4 MASK

  5. Unified mask data formats for EB writers

    Science.gov (United States)

    Kuriyama, Koki; Suzuki, Toshio; Hirumi, Junji; Yoshioka, Nobuyuki; Hojo, Yutaka; Kawase, Yuichi; Hara, Shigehiro; Hoga, Morihisa; Watanabe, Satoshi W.; Inoue, Masa; Kawase, Hidemuchi; Kamimoto, Tomoko

    2003-08-01

    Mask data preparation is a complicated process because many kinds of pattern files and jobdeck files flow into mask manufacturers. This situation has a significant impact on data preparation operations especially in mask manufacturers. In this paper, we propose a solution to this problem: use of unified mask data formats for EB writers and a model of data preparation flow from a device manufacturer to an EB writer. The unified formats consist of pattern data format named "NEO", and mask layout format named "MALY". NEO is a stream format which retains upper compatibility to GDSII and has higher compression rate than GDSII. NEO is intended to be a general input format of Variable-Shaped-Beam (VSB) mask writers in principle, not particularly designed for any specific equipment or software. Data conversion process between mask writers being taken into account, NEO requires some constraints for VSB mask writers, such as removal of overlapping figures. Due to many differences in jobdeck syntax and functions among mask writers, it is a complicated task to edit or modify a jobdeck, and convert it into another format. MALY is a text-based format whose purpose is to standardize mask layout information among mask writers. This unification of mask layout information optimized for EB writers is expected to reduce workload of mask data preparation significantly. Besides the information described in MALY, some other information specific to the target EB writer, such as drawing parameters, has to be prepared separately. This paper illustrates a model of data flow and benefits of using these unified formats. The format and the data flow are effective in reducing data handling cost, providing flexible data handling solution. Applying the handling flow using NEO and MALY would result in reducing the load on mask manufacturers. Moreover, device manufacturers would be freed from the need to specify the mask writer to be used when ordering masks to mask manufacturers.

  6. "The Mask Who Wasn't There": Visual Masking Effect with the Perceptual Absence of the Mask

    Science.gov (United States)

    Rey, Amandine Eve; Riou, Benoit; Muller, Dominique; Dabic, Stéphanie; Versace, Rémy

    2015-01-01

    Does a visual mask need to be perceptually present to disrupt processing? In the present research, we proposed to explore the link between perceptual and memory mechanisms by demonstrating that a typical sensory phenomenon (visual masking) can be replicated at a memory level. Experiment 1 highlighted an interference effect of a visual mask on the…

  7. A novel approach to mask defect inspection

    Science.gov (United States)

    Sagiv, Amir; Shirman, Yuri; Mangan, Shmoolik

    2008-10-01

    Memory chips, now constituting a major part of semiconductor market, posit a special challenge for inspection, as they are generally produced with the smallest half-pitch available with today's technology. This is true, in particular, to photomasks of advanced memory devices, which are at the forefront of the "low-k1" regime. In this paper we present a novel photomask inspection approach, that is particularly suitable for low-k1 layers of advanced memory chips, owing to their typical dense and periodic structure. The method we present can produce a very strong signal for small mask defects, by suppression of the modulation of the pattern's image. Unlike dark-field detection, however, here a single diffraction order associated with the pattern generates a constant "gray" background image, that is used for signal enhancement. We define the theoretical basis for the new detection technique, and show, both analytically and numerically, that it can easily achieve a detection line past the printability spec, and that in cases it is at least as sensitive as high-resolution based detection. We also demonstrate this claim experimentally on a customer mask, using the platform of Applied Material's newly released Aera2TM mask inspection tool. The high sensitivity demonstrates the important and often overlooked concept that resolution is not synonymous with sensitivity. The novel detection method is advantageous in several other aspects, such as the very simple implementation, the high throughput, and the relatively simple pre- and post-processing algorithms required for signal extraction. These features, and in particular the very high sensitivity, make this novel detection method an attractive inspection option for advanced memory devices.

  8. Submicron optical waveguides and microring resonators fabricated by selective oxidation of tantalum.

    Science.gov (United States)

    Rabiei, Payam; Ma, Jichi; Khan, Saeed; Chiles, Jeff; Fathpour, Sasan

    2013-03-25

    Submicron tantalum pentoxide ridge and channel optical waveguides and microring resonators are demonstrated on silicon substrates by selective oxidation of the refractory metal, tantalum. The novel method eliminates the surface roughness problem normally introduced during dry etching of waveguide sidewalls and also simplifies fabrication of directional couplers. It is shown that the measured propagation loss is independent of the waveguide structure and thereby limited by the material loss of tantalum pentoxide in waveguides core regions. The achieved microring resonators have cross-sectional dimensions of ~600 nm × ~500 nm, diameters as small as 80 µm with a quality, Q, factor of 4.5 × 10(4), and a finesse of 120.

  9. Monte Carlo sensitivity analysis of EUV mask reflectivity and its impact on OPC accuracy

    Science.gov (United States)

    Chen, Yulu; Wood, Obert; Rankin, Jed; Gullikson, Eric; Meyer-Ilse, Julia; Sun, Lei; Qi, Zhengqing John; Goodwin, Francis; Kye, Jongwook

    2017-03-01

    Unlike optical masks which are transmissive optical elements, use of extreme ultraviolet (EUV) radiation requires a reflective mask structure - a multi-layer coating consisting of alternating layers of high-Z (wave impedance) and low-Z materials that provide enhanced reflectivity over a narrow wavelength band peaked at the Bragg wavelength.1 Absorber side wall angle, corner rounding,2 surface roughness,3 and defects4 affect mask performance, but even seemingly simple parameters like bulk reflectivity on mirror and absorber surfaces can have a profound influence on imaging. For instance, using inaccurate reflectivity values at small and large incident angles would diminish the benefits of source mask co-optimization (SMO) and result in larger than expected pattern shifts. The goal of our work is to calculate the variation in mask reflectivity due to various sources of inaccuracies using Monte Carlo simulations. Such calculation is necessary as small changes in the thickness and optical properties of the high-Z and low-Z materials can cause substantial variations in reflectivity. This is further complicated by undesirable intermixing between the two materials used to create the reflector.5 One of the key contributors to mask reflectivity fluctuation is identified to be the intermixing layer thickness. We also investigate the impacts on OPC when the wrong mask information is provided, and evaluate the deterioration of overlapping process window. For a hypothetical N7 via layer, the lack of accurate mask information costs 25% of the depth of focus at 5% exposure latitude. Our work would allow the determination of major contributors to mask reflectivity variation, drive experimental efforts of measuring such contributors, provide strategies to optimize mask reflectivity, and quantize the OPC errors due to imperfect mask modeling.

  10. Ergonomic evaluation of pilot oxygen mask designs

    NARCIS (Netherlands)

    Lee, W.; Yang, Xiaopeng; Jung, Daehan; Park, Seikwon; Kim, Heeeun; You, Heecheon

    2018-01-01

    A revised pilot oxygen mask design was developed for better fit to the Korean Air Force pilots’ faces. The present study compared an existing pilot oxygen mask and a prototype of the revised mask design with 88 Korean Air Force pilots in terms of subjective discomfort, facial contact pressure,

  11. Submicron particle mass concentrations and sources in the Amazonian wet season (AMAZE-08)

    Science.gov (United States)

    Chen, Q.; Farmer, D. K.; Rizzo, L. V.; Pauliquevis, T.; Kuwata, M.; Karl, T. G.; Guenther, A.; Allan, J. D.; Coe, H.; Andreae, M. O.; Pöschl, U.; Jimenez, J. L.; Artaxo, P.; Martin, S. T.

    2015-04-01

    Real-time mass spectra of the non-refractory species in submicron aerosol particles were recorded in a tropical rainforest in the central Amazon Basin during the wet season from February to March 2008, as a part of the Amazonian Aerosol Characterization Experiment (AMAZE-08). Organic material accounted on average for more than 80% of the non-refractory submicron particle mass concentrations during the period of measurements. There was insufficient ammonium to neutralize sulfate. In this acidic, isoprene-rich, HO2-dominant environment, positive-matrix factorization of the time series of particle mass spectra identified four statistical factors to account for the 99% of the variance in the signal intensities of the organic constituents. The first factor was identified as associated with regional and local pollution and labeled "HOA" for its hydrocarbon-like characteristics. A second factor was associated with long-range transport and labeled "OOA-1" for its oxygenated characteristics. A third factor, labeled "OOA-2," was implicated as associated with the reactive uptake of isoprene oxidation products, especially of epoxydiols to acidic haze, fog, or cloud droplets. A fourth factor, labeled "OOA-3," was consistent with an association with the fresh production of secondary organic material (SOM) by the mechanism of gas-phase oxidation of biogenic volatile organic precursors followed by gas-to-particle conversion of the oxidation products. The suffixes 1, 2, and 3 on the OOA labels signify ordinal ranking with respect to the extent of oxidation represented by the factor. The process of aqueous-phase oxidation of water-soluble products of gas-phase photochemistry might also have been associated to some extent with the OOA-2 factor. The campaign-average factor loadings had a ratio of 1.4:1 for OOA-2 : OOA-3, suggesting the comparable importance of particle-phase compared to gas-phase pathways for the production of SOM during the study period.

  12. Vitreous carbon mask substrate for X-ray lithography

    Science.gov (United States)

    Aigeldinger, Georg [Livermore, CA; Skala, Dawn M [Fremont, CA; Griffiths, Stewart K [Livermore, CA; Talin, Albert Alec [Livermore, CA; Losey, Matthew W [Livermore, CA; Yang, Chu-Yeu Peter [Dublin, CA

    2009-10-27

    The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.

  13. Bacterial cellulose skin masks-Properties and sensory tests.

    Science.gov (United States)

    Pacheco, Guilherme; de Mello, Carolina Véspoli; Chiari-Andréo, Bruna Galdorfini; Isaac, Vera Lucia Borges; Ribeiro, Sidney José Lima; Pecoraro, Édison; Trovatti, Eliane

    2017-09-29

    Bacterial cellulose (BC) is a versatile material produced by microorganisms in the form of a membranous hydrogel, totally biocompatible, and endowed with high mechanical strength. Its high water-holding capacity based on its highly porous nanofibrillar structure allows BC to incorporate and to release substances very fast, thus being suitable for the preparation of skincare masks. The preparation and characterization of cosmetic masks based on BC membranes and active cosmetics. The masks were prepared by the simple incorporation of the cosmetic actives into BC membranes, used as a swelling matrix. The masks were characterized by Fourier transform infrared (FTIR), scanning electron microscopy (SEM), sensory tests, and skin moisture tests on volunteers. The results of sensory tests revealed the good performance of BC, being considered effective by the panel of volunteers, specially for adhesion to the skin (7.7 at the score scale), and improvement of the skin moisture (the hydration effect increased 76% in 75% of the volunteers that used vegetable extract mask formulation [VEM]), or a decrease in skin hydration (80% of the volunteers showed 32.6% decrease on skin hydration using propolis extract formulation [PEM] treatment), indicating the BC nanofiber membranes can be used to skincare applications. The results demonstrate the BC can be used as an alternative support for cosmetic actives for skin treatment. © 2017 Wiley Periodicals, Inc.

  14. Interaction between submicron COD crystals and renal epithelial cells.

    Science.gov (United States)

    Peng, Hua; Ouyang, Jian-Ming; Yao, Xiu-Qiong; Yang, Ru-E

    2012-01-01

    This study aims to investigate the adhesion characteristics between submicron calcium oxalate dihydrate (COD) with a size of 150 ± 50 nm and African green monkey kidney epithelial cells (Vero cells) before and after damage, and to discuss the mechanism of kidney stone formation. Vero cells were oxidatively injured by hydrogen peroxide to establish a model of injured cells. Scanning electron microscopy was used to observe Vero-COD adhesion. Inductively coupled plasma emission spectrometry was used to quantitatively measure the amount of adhered COD microcrystals. Nanoparticle size analyzer and laser scanning confocal microscopy were performed to measure the change in the zeta potential on the Vero cell surface and the change in osteopontin expression during the adhesion process, respectively. The level of cell injury was evaluated by measuring the changes in malonaldehyde content, and cell viability during the adhesion process. The adhesion capacity of Vero cells in the injury group to COD microcrystals was obviously stronger than that of Vero cells in the control group. After adhesion to COD, cell viability dropped, both malonaldehyde content and cell surface zeta potential increased, and the fluorescence intensity of osteopontin decreased because the osteopontin molecules were successfully covered by COD. Submicron COD further damaged the cells during the adhesion process, especially for Vero cells in the control group, leading to an elevated amount of attached microcrystals. Submicron COD can further damage injured Vero cells during the adhesion process. The amount of attached microcrystals is proportional to the degree of cell damage. The increased amount of microcrystals that adhered to the injured epithelial cells plays an important role in the formation of early-stage kidney stones.

  15. Highly sensitive measurement of submicron waveguides based on Brillouin scattering

    Science.gov (United States)

    Godet, Adrien; Ndao, Abdoulaye; Sylvestre, Thibaut; Beugnot, Jean-Charles; Phan Huy, Kien

    2017-02-01

    Fabrication and characterization of submicron optical waveguides is one of the major challenges in modern photonics, as they find many applications from optical sensors to plasmonic devices. Here we report on a novel technique that allows for a complete and precise characterization of silica optical nanofibers. Our method relies on the Brillouin backscattering spectrum analysis that directly depends on the waveguide geometry. Our method was applied to several fiber tapers with diameter ranging from 500 nm to 3 μm. Results were compared to scanning electron microscopy (SEM) images and numerical simulations with very good agreement and similar sensitivity.

  16. Electron acceleration via high contrast laser interacting with submicron clusters

    Energy Technology Data Exchange (ETDEWEB)

    Zhang Lu; Chen Liming; Wang Weiming; Yan Wenchao; Yuan Dawei; Mao Jingyi; Wang Zhaohua; Liu Cheng; Shen Zhongwei; Li Yutong; Dong Quanli; Lu Xin; Ma Jinglong; Wei Zhiyi [Beijing National Laboratory of Condensed Matter Physics, Institute of Physics, CAS, Beijing 100080 (China); Faenov, Anatoly; Pikuz, Tatiana [Joint Institute for High Temperature of the Russian Academy of Sciences, Izhorskaya 13/19, Moscow 127412 (Russian Federation); Quantum Beams Science Directorate, JAEA, Kizugawa, Kyoto (Japan); Li Dazhang [Beijing National Laboratory of Condensed Matter Physics, Institute of Physics, CAS, Beijing 100080 (China); Institute of High Energy Physics, CAS, Beijing 100049 (China); Sheng Zhengming [Department of Physics, Shanghai Jiao Tong University, Shanghai 200240 (China); Zhang Jie [Beijing National Laboratory of Condensed Matter Physics, Institute of Physics, CAS, Beijing 100080 (China); Department of Physics, Shanghai Jiao Tong University, Shanghai 200240 (China)

    2012-01-02

    We experimentally investigated electron acceleration from submicron size argon clusters-gas target irradiated by a 100 fs, 10 TW laser pulses having a high-contrast. Electron beams are observed in the longitudinal and transverse directions to the laser propagation. The measured energy of the longitudinal electron reaches 600 MeV and the charge of the electron beam in the transverse direction is more than 3 nC. A two-dimensional particle-in-cell simulation of the interaction has been performed and it shows an enhancement of electron charge by using the cluster-gas target.

  17. Submicron particle monitoring of paving and related road construction operations.

    Science.gov (United States)

    Freund, Alice; Zuckerman, Norman; Baum, Lisa; Milek, Debra

    2012-01-01

    This study identified activities and sources that contribute to ultrafine and other submicron particle exposure that could trigger respiratory symptoms in highway repair workers. Submicron particle monitoring was conducted for paving, milling, and pothole repair operations in a major metropolitan area where several highway repair workers were identified as symptomatic for respiratory illness following exposures at the 2001 World Trade Center disaster site. Exposure assessments were conducted for eight trades involved in road construction using a TSI P-Trak portable condensation particle counter. Direct readings near the workers' breathing zones and observations of activities and potential sources were logged on 7 days on 27 workers using four different models of pavers and two types of millers. Average worker exposure levels ranged from 2 to 3 times background during paving and from 1 to 4 times background during milling. During asphalt paving, average personal exposures to submicron particulates were 25,000-60,000, 28,000-70,000, and 23,000-37,000 particles/ cm(3) for paver operators, screed operators, and rakers, respectively. Average personal exposures during milling were 19,000-111,000, 28,000-81,000, and 19,000 particles/cm(3) for the large miller operators, miller screed operators, and raker, respectively. Personal peak exposures were measured up to 467,000 and 455,000 particles/cm(3) in paving and milling, respectively. Several sources of submicron particles were identified. These included the diesel and electric fired screed heaters; engine exhaust from diesel powered construction vehicles passing by or idling; raking, dumping, and paving of asphalt; exhaust from the hotbox heater; pavement dust or fumes from milling operations, especially when the large miller started and stopped; and secondhand cigarette smoke. To reduce the potential for health effects in workers, over 40 recommendations were made to control exposures, including improved maintenance of

  18. Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500

    Science.gov (United States)

    Maetoko, Kazuyuki; Tange, Koji; Fukuma, Hitoshi; Yoshioka, Nobuyuki; Kawada, Susumu; Ishizuka, Masahiko; Sasaki, Takaei; Sauer, Charles A.

    1999-08-01

    Halftone (HT) masks are a well-accepted method of manufacturing Phase Shift Masks (PSM). Recently, investigations of the suitability of HT masks for manufacturing have shifted from contact layers to gate devices. A regular supply of MoSiON-shifter HT mask blanks was obtained for this study. The MEBES 4500 pattern generator has been used for the electron beam writing of 250 nm design rule masks. However, this writing tool has sufficient performance to use in the next generation of masks. We have investigated the fabrication of MoSiON-HT mask using MEBES 4500. In general, because MoSiON is a very low conducting material, there are issues with pattern placement errors caused by charging. This charging effect can be reduced by utilizing an electrical conducting polymer (aquaSAVE) coated on the ZEP resist surface. The resulting registration error is corrected to the same level as that of conventional chrome blanks. Moreover we manufactured KrF-HT masks with contact-type patterns using HT blanks which were coated with electrical conducing polymer on the resist surface. From the results, we determined that we could manufacture production masks without any serious issues.

  19. Online submicron particle sizing by dynamic light scattering using autodilution

    Science.gov (United States)

    Nicoli, David F.; Elings, V. B.

    1989-01-01

    Efficient production of a wide range of commercial products based on submicron colloidal dispersions would benefit from instrumentation for online particle sizing, permitting real time monitoring and control of the particle size distribution. Recent advances in the technology of dynamic light scattering (DLS), especially improvements in algorithms for inversion of the intensity autocorrelation function, have made it ideally suited to the measurement of simple particle size distributions in the difficult submicron region. Crucial to the success of an online DSL based instrument is a simple mechanism for automatically sampling and diluting the starting concentrated sample suspension, yielding a final concentration which is optimal for the light scattering measurement. A proprietary method and apparatus was developed for performing this function, designed to be used with a DLS based particle sizing instrument. A PC/AT computer is used as a smart controller for the valves in the sampler diluter, as well as an input-output communicator, video display and data storage device. Quantitative results are presented for a latex suspension and an oil-in-water emulsion.

  20. Fabrication and commercialization of scalpel masks

    Science.gov (United States)

    Novembre, Anthony E.; Peabody, Milton L., Jr.; Blakey, Myrtle I.; Farrow, Reginald C.; Kasica, Richard J.; Liddle, James A.; Saunders, Thomas E.; Tennant, Donald M.

    1998-09-01

    SCALPEL masks have been fabricated for use in the Proof-of- Lithography system and to demonstrate the feasibility of having them produced by a commercial blank manufacturer and optical mask shops. Masks blanks are formed from 100 mm diameter silicon wafers. A 100-150 nm thick SiNx layer is LPCVD deposited onto the wafers followed by magnetron sputter deposition of a thin Cr/W metal layer which is used as the scatterer layer for the mask>the mask is supported by an underlying network of struts which are arranged to be compatible with the step and scan writing strategy of the exposure tool and to provide robustness to the mask. Crystallographic wet etching of the silicon wafer forms membranes and struts. To date over 300 mask blanks have been formed and yield data as a function of the thickness of the silicon nitride membrane has been quantified. Recent developments in the mask blank formation process include the production of blanks by MCNC who serve as a commercial source of SCALPEL mask blanks. They have successfully delivered 36 blanks that exhibit equivalent properties to those produced at Lucent. Mask patterning has been performed at the commercial optical mask shops of PHOTRONICS and DUPONT. In this investigation a MEBES exposure system has been used to write patterns. The resist used is ZEP-520 and development and pattern transfer processes are performed in the STEAG-Hammatech spray/spin processing tool. Metrology is performed using a KMS 310 RT optical microscope. Pattern placement accuracy is measured on the LMS 2020 system without modification. The masks are inspected for defects using the optical based KLA 300 series inspection system in a die to die mode and in transmission. Results to date suggest feasibility of producing SCALPEL masks by a commercial blank supplier and by merchant optical mask shops.

  1. Separating the signal from the noise: Expanding flow cytometry into the sub-micron range.

    Science.gov (United States)

    Cytometry Part A Special Section: Separating the signal from the noise: Expanding flow cytometry into the sub-micron range. The current Cytometry Part A Special Section presents three studies that utilize cytometers to study sub-micron particles. The three studies involve the 1...

  2. Magnetic trapping of superconducting submicron particles produced by laser ablation in superfluid helium

    Science.gov (United States)

    Takahashi, Yuta; Suzuki, Junpei; Yoneyama, Naoya; Tokawa, Yurina; Suzuki, Nobuaki; Matsushima, Fusakazu; Kumakura, Mitsutaka; Ashida, Masaaki; Moriwaki, Yoshiki

    2017-02-01

    We produced spherical superconducting submicron particles by laser ablation of their base metal tips in superfluid helium, and trapped them using a quadrupole magnetic field owing to the diamagnetism caused by the Meissner effect. We also measured their critical temperatures of superconductivity, by observing the threshold temperatures for the confinement of superconducting submicron particles in the trap.

  3. Masking author identity in peer review: what factors influence masking success? PEER Investigators.

    Science.gov (United States)

    Cho, M K; Justice, A C; Winker, M A; Berlin, J A; Waeckerle, J F; Callaham, M L; Rennie, D

    1998-07-15

    In a previous study, we found that masking success was higher at a journal that masked reviewers to author identity. We hypothesized that masking policy or other factors could be associated with masking success. To evaluate differences in success of masking reviewers to author identity at 7 biomedical journals and to identify factors associated with these differences. Written questionnaire. Reviewers at 3 journals with a long-standing policy of masking author identity (Annals of Emergency Medicine, Epidemiology, and Journal of the American Geriatrics Society) and 4 journals without a policy of masking author identity (Annals of Internal Medicine, JAMA, Obstetrics & Gynecology, and Ophthalmology). Masking success (percentage of reviewers successfully masked) and reviewer characteristics associated with masking. There was no significant difference in masking success between journals with a policy of masking (60%) and those without (58%) (P= .92). We found no association between masking success and a policy of masking when adjusted for the reviewer characteristics of age, sex, years of reviewing experience, number of articles published, number of articles reviewed, percentage of time spent in research, editorial experience, or academic rank (odds ratio [OR], 1.3; 95% confidence interval [CI], 0.64-2.8; P=.43). In multivariable analysis of reviewer characteristics, reviewers spending a greater percentage of time in research, the only significant predictor of masking success, were less likely to be successfully masked (OR, 1.01; 95% CI, 1.00-1.02) (P=.04). Masking success appears unrelated to a journal policy of masking, but is associated with reviewers' research experience and could be affected by other characteristics. Using reviewers with less research and reviewing experience might increase masking success, but the effect on review quality is unknown.

  4. A prospective, randomized, Single-blinded, comparative study of Classic Laryngeal Mask Airway and ProSeal Laryngeal Mask Airway in pediatric patients

    OpenAIRE

    Das, Bikramjit; Jamil, Shahin N; Mitra, Subhro; Varshney, Rohit K

    2012-01-01

    Context: ProSeal Laryngeal Mask Airway (PLMA) is extensively being used in pediatric anesthesia. Aims: To evaluate the efficacy of PLMA as compared to Classic Laryngeal Mask Airway (CLMA) for airway maintenance in pediatric patients. Settings and Design: A prospective, randomized, Single-blinded study was conducted in a tertiary care teaching hospital. Materials and Methods: Sixty ASA I and II children were included. Patients were randomized to either size 2 PLMA or size 2 CLMA gr...

  5. Discovering sub-micron ice particles across Dione' surface

    Science.gov (United States)

    Scipioni, Francesca; Schenk, Pual; Tosi, Federico; Clark, Roger; Dalle Ore, Cristina; Combe, Jean-Philippe

    2015-11-01

    Water ice is the most abundant component of Saturn’s mid-sized moons. However, these moons show an albedo asymmetry - their leading sides are bright while their trailing side exhibits dark terrains. Such differences arise from two surface alteration processes: (i) the bombardment of charged particles from the interplanetary medium and driven by Saturn’s magnetosphere on the trailing side, and (ii) the impact of E-ring water ice particles on the satellites’ leading side. As a result, the trailing hemisphere appears to be darker than the leading side. This effect is particularly evident on Dione's surface. A consequence of these surface alteration processes is the formation or the implantation of sub-micron sized ice particles.The presence of such particles influences and modifies the surfaces' spectrum because of Rayleigh scattering by the particles. In the near infrared range of the spectrum, the main sub-micron ice grains spectral indicators are: (i) asymmetry and (ii) long ward minimum shift of the absorption band at 2.02 μm (iii) a decrease in the ratio between the band depths at 1.50 and 2.02 μm (iv) a decrease in the height of the spectral peak at 2.6 μm (v) the suppression of the Fresnel reflection peak at 3.1 μm and (vi) the decrease of the reflection peak at 5 μm relative to those at 3.6 μm.We present results from our ongoing work mapping the variation of sub-micron ice grains spectral indicators across Dione' surface using Cassini-VIMS cubes acquired in the IR range (0.8-5.1 μm). To characterize the global variations of spectral indicators across Dione' surface, we divided it into a 1°x1° grid and then averaged the band depths and peak values inside each square cell.We will investigate if there exist a correspondence with water ice abundance variations by producing water ice' absorption band depths at 1.25, 1.52 and 2.02 μm, and with surface morphology by comparing the results with ISS color maps in the ultraviolet, visible and infrared

  6. Determination of IBIS mask transmission matrix

    Energy Technology Data Exchange (ETDEWEB)

    Sanchez, F. [Instituto de Fisica Corpuscular, CSIC-UV, Edificio Institutos de Paterna, P.O. BOX 22085, E-46071 Valencia (Spain)]. E-mail: filomeno@ific.uv.es; Reglero, V. [Astronomy and Space Science Group, Instituto de Ciencias de los Materiales, Universidad de Valencia, Edificio Institutos de Paterna, E-46071, Valencia (Spain); Chato, R. [Astronomy and Space Science Group, Instituto de Ciencias de los Materiales, Universidad de Valencia, Edificio Institutos de Paterna, E-46071, Valencia (Spain); Rodriguez-Alvarez, M.J. [Instituto de Matematica Multidisciplinar, Universidad Politecnica de Valencia, Camino de Vera s/n, E-46022, Valencia (Spain); Gasent, J.L. [Astronomy and Space Science Group, Instituto de Ciencias de los Materiales, Universidad de Valencia, Edificio Institutos de Paterna, E-46071, Valencia (Spain); Rodrigo, J. [Astronomy and Space Science Group, Instituto de Ciencias de los Materiales, Universidad de Valencia, Edificio Institutos de Paterna, E-46071, Valencia (Spain); Velasco, T. [Astronomy and Space Science Group, Instituto de Ciencias de los Materiales, Universidad de Valencia, Edificio Institutos de Paterna, E-46071, Valencia (Spain)

    2005-02-01

    The high-angular resolution imager IBIS is one of the two main instruments aboard the ESA INTEGRAL satellite launched in October 2002. IBIS uses coded aperture mask technique in order to provide the required imaging capabilities for energies between 15 and 10 MeV.The precise knowledge of the coded mask response function critically determine the IBIS imaging performances. In this paper, we present a general description of the IBIS coded mask design together with its main features. Transparency and homogeneity values of the IBIS mask flight model from our laboratory measurements are presented with indication of the instrumental set-up used and accuracy achieved. Mask transmission as a function of the energy and incident angle is presented and compared with Monte Carlo simulations. Finally, the mask transmission matrix for on-axis photons corrected for sources at infinity is also discussed.

  7. Short range investigation of sub-micron zirconia particles

    Energy Technology Data Exchange (ETDEWEB)

    Caracoche, M C; Martinez, J A [Departamento de Fisica, IFLP, Facultad de Ciencias Exactas, CICPBA, Universidad Nacional de La Plata (Argentina); Rivas, P C [IFLP-CONICET, Facultad de Ciencias Agrarias y Forestales, Universidad Nacional de La Plata (Argentina); Bondioli, F; Cannillo, V [Dipartimento di Ingegniria dei Materiali e dell' Ambiente, Facolta di Ingegneria, Universita di Modena e Reggio Emilia (Italy); Ferrari, A M, E-mail: cristina@fisica.unlp.edu.a [Dipartimento di Scienza a Metodi dell' Ingegneria, Universita di Modena e Reggio Emilia (Italy)

    2009-05-01

    The Perturbed Angular Correlations technique was used to determine the configurations around Zirconium ions and their thermal behavior in non-aggregated sub-micron zirconia spherical particles. Three residues containing- Zr surroundings were determined for the non-crystalline starting particles, which were identified under the assumption of a certain chemical reactions sequence during synthesis. While the one made up mainly by hydroxyl groups was common to both samples, the two involving mainly organic residues were particle size dependent. Upon crystallization, both samples stabilized in the t'- and t- tetragonal forms and the Xc-cubic form but their amounts and temperatures of appearance were different. On heating, the structure of the smaller particles became gradually monoclinic achieving total degradation upon the subsequent cooling to RT.

  8. Chemical strategies for die/wafer submicron alignment and bonding.

    Energy Technology Data Exchange (ETDEWEB)

    Martin, James Ellis; Baca, Alicia I.; Chu, Dahwey; Rohwer, Lauren Elizabeth Shea

    2010-09-01

    This late-start LDRD explores chemical strategies that will enable sub-micron alignment accuracy of dies and wafers by exploiting the interfacial energies of chemical ligands. We have micropatterned commensurate features, such as 2-d arrays of micron-sized gold lines on the die to be bonded. Each gold line is functionalized with alkanethiol ligands before the die are brought into contact. The ligand interfacial energy is minimized when the lines on the die are brought into registration, due to favorable interactions between the complementary ligand tails. After registration is achieved, standard bonding techniques are used to create precision permanent bonds. We have computed the alignment forces and torque between two surfaces patterned with arrays of lines or square pads to illustrate how best to maximize the tendency to align. We also discuss complex, aperiodic patterns such as rectilinear pad assemblies, concentric circles, and spirals that point the way towards extremely precise alignment.

  9. Microscopic methods in analysis of submicron phospholipid dispersions

    Directory of Open Access Journals (Sweden)

    Płaczek Marcin

    2016-03-01

    Full Text Available Microscopy belongs to the group of tests, used in pharmaceutical technology, that despite the lapse of time and the development of new analytical methods, still remain irreplaceable for the characterization of dispersed drug dosage forms (e.g., suspensions and emulsions. To obtain complete description of a specific drug formulation, such as parenteral colloidal products, a combination of different microscopic techniques is sometimes required. Electron microscopy methods are the most useful ones; however, even such basic methods as optical microscopy may be helpful for determination of some properties of a sample. The publication explicates the most popular microscopical techniques used nowadays for characterization of the morphology of nanoparticles suspended in pharmaceutical formulations; ad vantages and disadvantages of these methods are also discussed. Parenteral submicron formulations containing lecithin or a particular phospholipid were chosen as examples.

  10. Lithographic Performance Enhancement Using Dummy Diffraction Mask

    Science.gov (United States)

    Yoo, Hyung Joun; Oh, Yong-Ho; Park, Byung-Sun; Choi, Sang Soo; Jeon, Young Jin; Lee, Choochon; Park, Sin-Chong

    1993-12-01

    The basic lithographic characteristics of the dummy diffraction mask which has two (dummy and main) mask layers, are investigated by simulation and experiment. The basic principle and theoretical details of the dummy diffraction mask are explained. Influences on the aerial image by the gap size and misorientation between two mask layers and by the nonideal phase grating, are simulated. Also, results of the lithographic performances for the simple patterns (line/space, isolated line, isolated space) and the complex patterns (V-shape active pattern in dynamic random access memory core cell) are presented.

  11. High-productivity mask writer with broad operating range

    Science.gov (United States)

    Baik, Ki-Ho; Chakarian, Varoujan; Dean, Bob; Lu, Maiying; Naber, Robert J.; Newman, Thomas H.; Wiltse, Mark; Abboud, Frank E.

    2001-09-01

    Photomask complexity increases rapidly as semiconductor devices continue to shrink and as optical proximity correction becomes commonplace. This trend stresses the performance of mask pattern generators due to the increase in both primary and subresolution features. However, the next-generation MEBES raster scan architecture is well-suited to the challenge of maintaining throughput regardless of increases in pattern complexity. In addition, this new system provides an operating envelope that is sufficiently broad to expose all practical resist materials with a fixed number of writing passes. Write time is independent of material sensitivity, which has the benefits of allowing high-dose processes to be optimized, and also of supporting a wide selection of chemically amplified resist candidates for critical mask patterning. The new system shows the promise of being extendible to the 70 nm technology generation.

  12. Variations in backward masking with different masking stimuli: I. Local interaction versus attentional switch.

    Science.gov (United States)

    Bachmann, Talis; Luiga, Iiris; Põder, Endel

    2005-01-01

    The types of stimuli used as targets and masks considerably change the masking functions in a way that requires us to abandon any single mechanism of masking as the sole explanation of backward masking. In the first of two reports in which the problem of the mask-dependence of masking is addressed, we explore the role of the relative spatial positioning of targets and masks in order to differentiate between local interaction and attentional models. If single letters were masked by double-letter masks then the relative spatial arrangement of the letters, which was changed in order to vary the involvement of metacontrast-like processes, had an effect at shorter SOAs, but not at longer SOAs where strong masking still persisted. This poses difficulties for proposing local contour interaction as the main mechanism of masking. Similarly, crowding effects alone cannot explain the results. Backward masking also involves attention being directed to working-memory processing of the succeeding object while abandoning the preceding object.

  13. SiO2/ZnO Composite Hollow Sub-Micron Fibers: Fabrication from Facile Single Capillary Electrospinning and Their Photoluminescence Properties.

    Science.gov (United States)

    Song, Guanying; Li, Zhenjiang; Li, Kaihua; Zhang, Lina; Meng, Alan

    2017-02-24

    In this work, SiO2/ZnO composite hollow sub-micron fibers were fabricated by a facile single capillary electrospinning technique followed by calcination, using tetraethyl orthosilicate (TEOS), polyvinylpyrrolidone (PVP) and ZnO nanoparticles as raw materials. The characterization results of the scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FT-IR) spectra indicated that the asprepared composite hollow fibers consisted of amorphous SiO2 and hexagonal wurtzite ZnO. The products revealed uniform tubular structure with outer diameters of 400-500 nm and wall thickness of 50-60 nm. The gases generated and the directional escaped mechanism was proposed to illustrate the formation of SiO2/ZnO composite hollow sub-micron fibers. Furthermore, a broad blue emission band was observed in the photoluminescence (PL) of SiO2/ZnO composite hollow sub-micron fibers, exhibiting great potential applications as blue light-emitting candidate materials.

  14. SiO2/ZnO Composite Hollow Sub-Micron Fibers: Fabrication from Facile Single Capillary Electrospinning and Their Photoluminescence Properties

    Directory of Open Access Journals (Sweden)

    Guanying Song

    2017-02-01

    Full Text Available In this work, SiO2/ZnO composite hollow sub-micron fibers were fabricated by a facile single capillary electrospinning technique followed by calcination, using tetraethyl orthosilicate (TEOS, polyvinylpyrrolidone (PVP and ZnO nanoparticles as raw materials. The characterization results of the scanning electron microscopy (SEM, transmission electron microscopy (TEM, X-ray diffraction (XRD and Fourier transform infrared spectroscopy (FT-IR spectra indicated that the asprepared composite hollow fibers consisted of amorphous SiO2 and hexagonal wurtzite ZnO. The products revealed uniform tubular structure with outer diameters of 400–500 nm and wall thickness of 50–60 nm. The gases generated and the directional escaped mechanism was proposed to illustrate the formation of SiO2/ZnO composite hollow sub-micron fibers. Furthermore, a broad blue emission band was observed in the photoluminescence (PL of SiO2/ZnO composite hollow sub-micron fibers, exhibiting great potential applications as blue light-emitting candidate materials.

  15. Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

    Science.gov (United States)

    Kamikubo, Takashi; Ohnishi, Takayuki; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi; Bai, Shufeng; Wang, Jen-Shiang; Howell, Rafael; Chen, George; Li, Jiangwei; Tao, Jun; Wiley, Jim; Kurosawa, Terunobu; Saito, Yasuko; Takigawa, Tadahiro

    2010-09-01

    In electron beam writing on EUV mask, it has been reported that CD linearity does not show simple signatures as observed with conventional COG (Cr on Glass) masks because they are caused by scattered electrons form EUV mask itself which comprises stacked heavy metals and thick multi-layers. To resolve this issue, Mask Process Correction (MPC) will be ideally applicable. Every pattern is reshaped in MPC. Therefore, the number of shots would not increase and writing time will be kept within reasonable range. In this paper, MPC is extended to modeling for correction of CD linearity errors on EUV mask. And its effectiveness is verified with simulations and experiments through actual writing test.

  16. Size effects in piezoelectric cantilevers at submicron thickness levels due to flexoelectricity

    Science.gov (United States)

    Moura, Adriane G.; Erturk, Alper

    2017-04-01

    In elastic dielectrics, piezoelectricity is the response of polarization to applied mechanical strain, and vice versa. Piezoelectric coupling is controlled by a third-rank tensor and is allowed only in materials that are non-centrosymmetric. Flexoelectricity, however, is the generation of electric polarization by the application of a non-uniform mechanical strain field, i.e. a strain gradient, and is expected to be pronounced at submicron thickness levels, especially at the nano-scale. Flexoelectricity is controlled by a fourth-rank tensor and is therefore allowed in materials of any symmetry. As a gradient effect, flexoelectricity is size dependent, while piezoelectric coupling has no size dependence. Any ordinary piezoelectric cantilever model developed for devices above micron-level thickness has to be modified for nano-scale piezoelectric devices since the effect of flexoelectric coupling will change the electroelastic dynamics at such small scales. In this work, we establish and explore a complete analytical framework by accounting for both the piezoelectric and flexoelectric effects. The focus is placed on the development of governing electroelastodynamic piezoelectric-flexoelectric equations for the problems of energy harvesting, sensing, and actuation. The coupled governing equations are analyzed to obtain the frequency response. The coupling coefficient for the bimorph configuration is identified and its size dependence is explored.

  17. Sinusoidal masks for single channel speech separation

    DEFF Research Database (Denmark)

    Mowlaee, Pejman; Christensen, Mads Græsbøll; Jensen, Søren Holdt

    2010-01-01

    that the proposed method is able to minimize the target speech distortion while suppressing the crosstalk to a predetermined threshold. It is observed that compared to the STFTbased masks, the proposed sinusoidal masks improve the separation performance in terms of objective measures (SSNR and PESQ) and are mostly...

  18. High resolution shadow mask patterning in deep holes and its application to an electrical wafer feed-through

    NARCIS (Netherlands)

    Burger, G.J.; Burger, G.J.; Smulders, E.J.T.; Berenschot, Johan W.; Lammerink, Theodorus S.J.; Fluitman, J.H.J.; Imai, S.

    1995-01-01

    This paper presents a technique to pattern materials in deep holes and/or on non-planar substrate surfaces. A rather old technique, E-beam evaporation of metals through a shadow mask, is used [1]. The realisation of high resolution shadow masks using micromachining techniques is described. Further,

  19. [Study on preparation of intravenous submicron emulsions of Oleum Cinnamomi oil of Miao nationality herbal].

    Science.gov (United States)

    Li, Jiang; Liu, Ying-bo

    2007-11-01

    To study the prescription and preparation of intravenous submicron emulsion of Oleum Cinnamomi oil of Miao nationality herbal. Using the high speed blender mixed round the Oleum Cinnamomi oil with the soybean phospholipids and Pluronic F68 as emulsifier, then using the high pressure homogenizer made the intravenous submicron emulsion of the Oleum Cinnamomi oil and investigate its grain path and distributing. Having been done by using hydroextractor 4,500 r min(-1) 15 minutes the submicron emulsion grain path has well proportioned distribution. The preparation technology is simple and has good stability, so it can be used as a method to make the intravenous submicron emulsion of the Oleum Cinnamomi oil of Miao nationality herbal.

  20. Beschrijving van een verdampings-condensatie aerosol generator voor de produktie van submicron aerosol

    NARCIS (Netherlands)

    Feijt; A.*; Meulen; A.van der

    1985-01-01

    Dit rapport is een handleiding voor een bedrijfszeker, routinematig gebruik van een zgn. Evaporation-Condensation aerosol Conditioner. Met deze aerosol generatie apparatuur kunnen op stabiele, reproduceerbare manier zeer hoge concentraties (tot 1 miljoen deeltjes per cc) monodispers submicron

  1. New method of detection and classification of yield-impacting EUV mask defects

    Science.gov (United States)

    Graur, Ioana; Vengertsev, Dmitry; Raghunathan, Ananthan; Stobert, Ian; Rankin, Jed

    2015-10-01

    Extreme ultraviolet lithography (EUV) advances printability of small size features for both memory and logic semiconductor devices. It promises to bring relief to the semiconductor manufacturing industry, removing the need for multiple masks in rendering a single design layer on wafer. However, EUV also brings new challenges, one of which is of mask defectivity. For this purpose, much of the focus in recent years has been in finding ways to adequately detect, characterize, and reduce defects on both EUV blanks and patterned masks. In this paper we will present an efficient way to classify and disposition EUV mask defects through a new algorithm developed to classify defects located on EUV photomasks. By processing scanning electronmicroscopy images (SEM) of small regions of a photomask, we extract highdimensional local features Histograms of Oriented Gradients (HOG). Local features represent image contents compactly for detection or classification, without requiring image segmentation. Using these HOGs, a supervised classification method is applied which allows differentiating between nondefective and defective images. In the new approach we have developed a superior method of detection and classification of defects, using mask and supporting mask printed data from several metallization masks. We will demonstrate that use of the HOG method allows realtime identification of defects on EUV masks regardless of geometry or construct. The defects identified by this classifier are further divided into subclasses for mask defect disposition: foreign material, foreign material from previous step, and topological defects. The goal of disposition is to categorize on the images into subcategories and provide recommendation of prescriptive actions to avoid impact on the wafer yield.

  2. Characteristics of Submicron Aerosols in 2013 summer of Beijing

    Science.gov (United States)

    Guo, Song; Hu, Min; Shang, Dongjie; Zheng, Jing; Du, Zhuofei; Wu, Yusheng; Lu, Sihua; Zeng, Limin; Zhang, Renyi

    2016-04-01

    To characterize the air pollution of North China Plain of China, CAREBEIJING-2013 field campaign (Campaigns of Air quality REsearch in BEIJING and surrounding region) was conducted in summer of 2013. Submicron aerosols were measured at an urban site PKU (Peking University, 39° 59'21"N, 116° 18'25"E) from July 28th to September 31st 2013. A suite of integrated instruments was used to measure the size distribution, effective density and hygroscopicity of ambient particles. The chemical composition of submicron particles were measured by using an Aerodyne High-Resolution Time-of-Flight Aerosol Mass Spectrometer (HR-ToF-AMS) (Billerica, MA, USA). The average PM2.5 concentration was 73.0±70.7 μg m-3 during the measurement. The particulate pollution showed distinct 4-7 days cycles controlled by the meteorological conditions. Each cycle started with low PM2.5 mass concentrations (air mass was from relatively clean mountainous area. The particle number concentrations were high, but and the sizes were small (60 μg day-1, and the particle mean diameter grew to >100 nm. It is interesting to note that the mean diameters showed similar trend to PM2.5 mass concentrations, indicating the particle pollution attributed to the growth of the newly formed small particles. During the measurement, the average particle densities are between 1.3-1.5 g cm-3, indicating organics and sulfate were dominant in the particles. The densities of smaller particles, i.e. 46 nm, 81nm, showed single peak at 1.3-1.5 g cm-3, indicating the particles are internal mixed sulfate and organics. While the 150nm and 240 nm particle densities exhibited bimodal distribution with an additional small peak at ˜1.1 g cm-3, which is considered as external mixed organic particles or aged soot particles. The particle hygroscopic growth factor for all the measured sizes at RH of 90% showed bimodal distribution, attributing to external mixed organics (or aged soot) and internal mixed organics and sulfate. Both the

  3. High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron X-ray diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Tamura, N.; MacDowell, A.A.; Celestre, R.S.; Padmore, H.A.; Valek, B.C.; Bravman, J.C.; Spolenak, R.; Brown, W.L.; Marieb, T.; Fujimoto, H.; Batterman, B.W.; Patel, J.R.

    2002-03-26

    The availability of high brilliance synchrotron sources, coupled with recent progress in achromatic focusing optics and large area 2D detector technology, have allowed us to develop an X-ray synchrotron technique capable of mapping orientation and strain/stress in polycrystalline thin films with submicron spatial resolution. To demonstrate the capabilities of this instrument, we have employed it to study the microstructure of aluminum thin film structures at the granular and subgranular level. Owing to the relatively low absorption of X-rays in materials, this technique can be used to study passivated samples, an important advantage over most electron probes given the very different mechanical behavior of buried and unpassivated materials.

  4. High Spatial Resolution Grain Orientation and Strain Mapping in Thin Films using Polychromatic Submicron X-ray Diffraction

    Energy Technology Data Exchange (ETDEWEB)

    Patel, Jamshed R.

    2002-06-14

    The availability of high brilliance synchrotron sources, coupled with recent progress in achromatic focusing optics and large area 2D detector technology, have allowed us to develop a X-ray synchrotron technique capable of mapping orientation and strain/stress in polycrystalline thin films with submicron spatial resolution. To demonstrate the capabilities of this instrument, we have employed it to study the microstructure of aluminum thin film structures at the granular and subgranular level. Owing to the relatively low absorption of X-rays in materials, this technique can be used to study passivated samples, an important advantage over most electron probes given the very different mechanical behavior of buried and unpassivated materials.

  5. Reflective masks for 1X deep ultraviolet lithography

    Science.gov (United States)

    Hsieh, Robert L.; Lee, Julienne Y.; Maluf, Nadim I.; Browning, Raymond; Jerabek, Paul; Pease, R. Fabian W.; Owen, Geraint

    1992-01-01

    Recent work has demonstrated the high resolution optical performance possible with simple 1X mostly-reflective optics: using 248 nm light from a mercury arc lamp, 0.25 micrometers features were delineated across a 2 mm radius semicircular field, and much large fields are possible with a scaled up version. The mask required for this system consists of a quartz substrate, a patterned thin film reflector, and a nonreflective backing which also serves to protect the reflector film. The mask is reflective at the quartz/reflector interface so the substrate is part of the projection optical path and so acts as the pellicle. We have investigated chromium, silicon, and aluminum for the reflector material; their reflection coefficients at 248 nm at the quartz-reflector interface are 30, 55, and 90 percent, respectively. Silicon has been chosen because it has a practical combination of reflectivity and ease of deposition and etching. Moreover films as thin as 30 nm provide the full (bulk-value) reflection and so precise etching is further facilitated. Among possible absorber materials, novolak photoresist is a practical choice having a quartz/film reflectivity of 1%. Features down to 0.25 micrometers are regularly patterned for these masks with a MEBES I using Shipley SAL-601 or PMMA electron beam resist.

  6. Pixel mask-based three-dimensional display with uniform resolution

    Science.gov (United States)

    Zhao, Bai-Chuan; Lv, Guo-Jiao; Wu, Fei; Zhao, Wu-Xiang; Deng, Huan; Wang, Qiong-Hua

    2017-07-01

    A pixel mask-based three-dimensional (3-D) display with uniform resolution is proposed. This 3-D display consists of a reflected light source, a pixel mask, a liquid crystal display (LCD) panel, and a lenticular lens. The reflected light source is located on the bottom layer of the proposed 3-D display. It has a reflective structure to improve optical efficiency, so it can make up the brightness loss, which is caused by the pixel mask. The pixel mask is located between the reflected light source and the LCD panel, and is attached on the back surface of the LCD panel. This pixel mask is made of a reflective material, and some transparent areas are etched on it. The pixel mask redefines the pixels of the two-dimensional display panel located in front of it, so the size and location of redefined pixels depend on the transparent area of the pixel mask. The arrangement of the redefined pixels can increase the column numbers of synthetic images. Therefore, the synthetic images can make 3-D images have uniform resolution. A 4-view prototype of this display is developed and the experimental result shows the proposed method can improve resolution uniformity successfully.

  7. Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

    Science.gov (United States)

    Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Philipsen, Vicky; Luong, Vu; Hendrickx, Eric

    2017-06-01

    The reflection and diffraction of extreme ultraviolet (EUV) light from lithographic masks and the projection imaging of these masks by all-reflective systems introduce several significant imaging artifacts. The off-axis illumination of the mask causes asymmetric shadowing, a size bias between features with different orientations and telecentricity errors. The image contrast varies with the feature orientation and can easily drop far below intuitively expected values. The deformation of the wavefront or phase of the incident light by thick absorbers generates aberration-like effects, especially variations of the best-focus (BF) position vs. the pitch and size of the imaged patterns. Partial reflection of light from the top of the absorber generates a weak secondary image, which superposes with the main image. Based on a discussion of the root causes of these phenomena, we employ mask diffraction and imaging analysis for a quantitative analysis of these effects for standard EUV masks. Simulations for various non-standard types of mask stacks (e.g. etched multilayers, buried shifters, etc.) and for various non-standard absorber materials are used to explore the imaging capabilities of alternative masks for EUV lithography. Finally, an outlook at anamorphic systems for larger numerical apertures is given.

  8. Controlled motion of domain walls in submicron amorphous wires

    Directory of Open Access Journals (Sweden)

    Mihai Ţibu

    2016-05-01

    Full Text Available Results on the control of the domain wall displacement in cylindrical Fe77.5Si7.5B15 amorphous glass-coated submicron wires prepared by rapid quenching from the melt are reported. The control methods have relied on conical notches with various depths, up to a few tens of nm, made in the glass coating and in the metallic nucleus using a focused ion beam (FIB system, and on the use of small nucleation coils at one of the sample ends in order to apply magnetic field pulses aimed to enhance the nucleation of reverse domains. The notch-based method is used for the first time in the case of cylindrical ultrathin wires. The results show that the most efficient technique of controlling the domain wall motion in this type of samples is the simultaneous use of notches and nucleation coils. Their effect depends on wire diameter, notch depth, its position on the wire length, and characteristics of the applied pulse.

  9. Controlled motion of domain walls in submicron amorphous wires

    Energy Technology Data Exchange (ETDEWEB)

    Ţibu, Mihai; Lostun, Mihaela; Rotărescu, Cristian; Atiţoaie, Alexandru; Lupu, Nicoleta; Óvári, Tibor-Adrian, E-mail: taovari@phys-iasi.ro; Chiriac, Horia [Department of Magnetic Materials and Devices, National Institute of Research and Development for Technical Physics, Iaşi, 700050 (Romania); Allwood, Dan A. [Department of Materials Science and Engineering, University of Sheffield, Sheffield, S1 3JD (United Kingdom)

    2016-05-15

    Results on the control of the domain wall displacement in cylindrical Fe{sub 77.5}Si{sub 7.5}B{sub 15} amorphous glass-coated submicron wires prepared by rapid quenching from the melt are reported. The control methods have relied on conical notches with various depths, up to a few tens of nm, made in the glass coating and in the metallic nucleus using a focused ion beam (FIB) system, and on the use of small nucleation coils at one of the sample ends in order to apply magnetic field pulses aimed to enhance the nucleation of reverse domains. The notch-based method is used for the first time in the case of cylindrical ultrathin wires. The results show that the most efficient technique of controlling the domain wall motion in this type of samples is the simultaneous use of notches and nucleation coils. Their effect depends on wire diameter, notch depth, its position on the wire length, and characteristics of the applied pulse.

  10. Submicron Surface Vibration Profiling Using Doppler Self-Mixing Techniques

    Directory of Open Access Journals (Sweden)

    Tânia Pereira

    2014-01-01

    Full Text Available Doppler self-mixing laser probing techniques are often used for vibration measurement with very high accuracy. A novel optoelectronic probe solution is proposed, based on off-the-shelf components, with a direct reflection optical scheme for contactless characterization of the target’s movement. This probe was tested with two test bench apparatus that enhance its precision performance, with a linear actuator at low frequency (35 µm, 5–60 Hz, and its dynamics, with disc shaped transducers for small amplitude and high frequency (0.6 µm, 100–2500 Hz. The results, obtained from well-established signal processing methods for self-mixing Doppler signals, allowed the evaluation of vibration velocity and amplitudes with an average error of less than 10%. The impedance spectrum of piezoelectric (PZ disc target revealed a maximum of impedance (around 1 kHz for minimal Doppler shift. A bidimensional scan over the PZ disc surface allowed the categorization of the vibration mode (0, 1 and explained its deflection directions. The feasibility of a laser vibrometer based on self-mixing principles and supported by tailored electronics able to accurately measure submicron displacements was, thus, successfully demonstrated.

  11. Reflective masks for extreme ultraviolet lithography

    Energy Technology Data Exchange (ETDEWEB)

    Nguyen, Khanh Bao [Univ. of California, Berkeley, CA (United States)

    1994-05-01

    Extreme ultraviolet lithographic masks are made by patterning multilayer reflective coatings with high normal incidence reflectivity. Masks can be patterned by depositing a patterned absorber layer above the coating or by etching the pattern directly into the coating itself. Electromagnetic simulations showed that absorber-overlayer masks have superior imaging characteristics over etched masks (less sensitive to incident angles and pattern profiles). In an EUVL absorber overlayer mask, defects can occur in the mask substrate, reflective coating, and absorber pattern. Electromagnetic simulations showed that substrate defects cause the most severe image degradation. A printability study of substrate defects for absorber overlayer masks showed that printability of 25 nm high substrate defects are comparable to defects in optical lithography. Simulations also indicated that the manner in which the defects are covered by multilayer reflective coatings can affect printability. Coverage profiles that result in large lateral spreading of defect geometries amplify the printability of the defects by increasing their effective sizes. Coverage profiles of Mo/Si coatings deposited above defects were studied by atomic force microscopy and TEM. Results showed that lateral spread of defect geometry is proportional to height. Undercut at defect also increases the lateral spread. Reductions in defect heights were observed for 0.15 μm wide defect lines. A long-term study of Mo/Si coating reflectivity revealed that Mo/Si coatings with Mo as the top layer suffer significant reductions in reflectivity over time due to oxidation.

  12. Acoustic Emission Patterns and the Transition to Ductility in Sub-Micron Scale Laboratory Earthquakes

    Science.gov (United States)

    Ghaffari, H.; Xia, K.; Young, R.

    2013-12-01

    We report observation of a transition from the brittle to ductile regime in precursor events from different rock materials (Granite, Sandstone, Basalt, and Gypsum) and Polymers (PMMA, PTFE and CR-39). Acoustic emission patterns associated with sub-micron scale laboratory earthquakes are mapped into network parameter spaces (functional damage networks). The sub-classes hold nearly constant timescales, indicating dependency of the sub-phases on the mechanism governing the previous evolutionary phase, i.e., deformation and failure of asperities. Based on our findings, we propose that the signature of the non-linear elastic zone around a crack tip is mapped into the details of the evolutionary phases, supporting the formation of a strongly weak zone in the vicinity of crack tips. Moreover, we recognize sub-micron to micron ruptures with signatures of 'stiffening' in the deformation phase of acoustic-waveforms. We propose that the latter rupture fronts carry critical rupture extensions, including possible dislocations faster than the shear wave speed. Using 'template super-shear waveforms' and their network characteristics, we show that the acoustic emission signals are possible super-shear or intersonic events. Ref. [1] Ghaffari, H. O., and R. P. Young. "Acoustic-Friction Networks and the Evolution of Precursor Rupture Fronts in Laboratory Earthquakes." Nature Scientific reports 3 (2013). [2] Xia, Kaiwen, Ares J. Rosakis, and Hiroo Kanamori. "Laboratory earthquakes: The sub-Rayleigh-to-supershear rupture transition." Science 303.5665 (2004): 1859-1861. [3] Mello, M., et al. "Identifying the unique ground motion signatures of supershear earthquakes: Theory and experiments." Tectonophysics 493.3 (2010): 297-326. [4] Gumbsch, Peter, and Huajian Gao. "Dislocations faster than the speed of sound." Science 283.5404 (1999): 965-968. [5] Livne, Ariel, et al. "The near-tip fields of fast cracks." Science 327.5971 (2010): 1359-1363. [6] Rycroft, Chris H., and Eran Bouchbinder

  13. A novel anti-influenza copper oxide containing respiratory face mask.

    Directory of Open Access Journals (Sweden)

    Gadi Borkow

    Full Text Available BACKGROUND: Protective respiratory face masks protect the nose and mouth of the wearer from vapor drops carrying viruses or other infectious pathogens. However, incorrect use and disposal may actually increase the risk of pathogen transmission, rather than reduce it, especially when masks are used by non-professionals such as the lay public. Copper oxide displays potent antiviral properties. A platform technology has been developed that permanently introduces copper oxide into polymeric materials, conferring them with potent biocidal properties. METHODOLOGY/PRINCIPAL FINDINGS: We demonstrate that impregnation of copper oxide into respiratory protective face masks endows them with potent biocidal properties in addition to their inherent filtration properties. Both control and copper oxide impregnated masks filtered above 99.85% of aerosolized viruses when challenged with 5.66+/-0.51 and 6.17+/-0.37 log(10TCID(50 of human influenza A virus (H1N1 and avian influenza virus (H9N2, respectively, under simulated breathing conditions (28.3 L/min. Importantly, no infectious human influenza A viral titers were recovered from the copper oxide containing masks within 30 minutes (< or = 0.88 log(10TCID(50, while 4.67+/-1.35 log(10TCID(50 were recovered from the control masks. Similarly, the infectious avian influenza titers recovered from the copper oxide containing masks were < or = 0.97+/-0.01 log(10TCID(50 and from the control masks 5.03+/-0.54 log(10TCID(50. The copper oxide containing masks successfully passed Bacterial Filtration Efficacy, Differential Pressure, Latex Particle Challenge, and Resistance to Penetration by Synthetic Blood tests designed to test the filtration properties of face masks in accordance with the European EN 14683:2005 and NIOSH N95 standards. CONCLUSIONS/SIGNIFICANCE: Impregnation of copper oxide into respiratory protective face masks endows them with potent anti-influenza biocidal properties without altering their physical

  14. Germanium Lift-Off Masks for Thin Metal Film Patterning

    Science.gov (United States)

    Brown, Ari

    2012-01-01

    A technique has been developed for patterning thin metallic films that are, in turn, used to fabricate microelectronics circuitry and thin-film sensors. The technique uses germanium thin films as lift-off masks. This requires development of a technique to strip or undercut the germanium chemically without affecting the deposited metal. Unlike in the case of conventional polymeric lift-off masks, the substrate can be exposed to very high temperatures during processing (sputter deposition). The reason why polymeric liftoff masks cannot be exposed to very high temperatures (greater than 100 C) is because (a) they can become cross linked, making lift-off very difficult if not impossible, and (b) they can outgas nitrogen and oxygen, which then can react with the metal being deposited. Consequently, this innovation is expected to find use in the fabrication of transition edge sensors and microwave kinetic inductance detectors, which use thin superconducting films deposited at high temperature as their sensing elements. Transition edge sensors, microwave kinetic inductance detectors, and their circuitry are comprised of superconducting thin films, for example Nb and TiN. Reactive ion etching can be used to pattern these films; however, reactive ion etching also damages the underlying substrate, which is unwanted in many instances. Polymeric lift-off techniques permit thin-film patterning without any substrate damage, but they are difficult to remove and the polymer can outgas during thin-film deposition. The outgassed material can then react with the film with the consequence of altered and non-reproducible materials properties, which, in turn, is deleterious for sensors and their circuitry. The purpose of this innovation was to fabricate a germanium lift-off mask to be used for patterning thin metal films.

  15. Nanostructured Materials for Magnetoelectronics

    CERN Document Server

    Mikailzade, Faik

    2013-01-01

    This book provides an up-to-date review of nanometer-scale magnetism and focuses on the investigation of the basic properties of magnetic nanostructures. It describes a wide range of physical aspects together with theoretical and experimental methods. A broad overview of the latest developments in this emerging and fascinating field of nanostructured materials is given with emphasis on the practical understanding and operation of submicron devices based on nanostructured magnetic materials.

  16. Predicting masking release of lateralized speech

    DEFF Research Database (Denmark)

    Chabot-Leclerc, Alexandre; MacDonald, Ewen; Dau, Torsten

    2016-01-01

    Locsei et al. (2015) [Speech in Noise Workshop, Copenhagen, 46] measured ˝ speech reception thresholds (SRTs) in anechoic conditions where the target speech and the maskers were lateralized using interaural time delays. The maskers were speech-shaped noise (SSN) and reversed babble with 2, 4, or 8....... The largest masking release (MR) was observed when all maskers were on the opposite side of the target. The data in the conditions containing only energetic masking and modulation masking could be accounted for using a binaural extension of the speech-based envelope power spectrum model [sEPSM; Jørgensen et...

  17. Modelling size and structure of nanoparticles formed from drying of submicron solution aerosols

    Science.gov (United States)

    Bandyopadhyay, Arpan A.; Pawar, Amol A.; Venkataraman, Chandra; Mehra, Anurag

    2015-01-01

    Drying of submicron solution aerosols, under controlled conditions, has been explored to prepare nanoparticles for drug delivery applications. A computational model of solution drop evaporation is developed to study the evolution of solute gradients inside the drop and predict the size and shell thickness of precipitating nanoparticles. The model considers evaporation as a two-stage process involving droplet shrinkage and shell growth. It was corroborated that droplet evaporation rate controls the solute distribution within a droplet and the resulting particle structure (solid or shell type). At higher gas temperatures, rapid build-up of solute near drop surface from high evaporation rates results in early attainment of critical supersaturation solubility and a steeper solute gradient, which favours formation of larger, shell-type particles. At lower gas temperatures, formation of smaller, solid nanoparticles is indicated. The computed size and shell thickness are in good agreement with experimentally prepared lipid nanoparticles. This study indicates that solid or shell structure of precipitated nanoparticles is strongly affected by evaporation rate, while initial solute concentration in the precursor solution and atomized droplet size affect shell thickness. For the gas temperatures considered, evaporative cooling leads to droplet temperature below the melting point of the lipid solute. Thus, we conclude that control over nanoparticle size and structure, of thermolabile precursor materials suitable for drug delivery, can be achieved by controlling evaporation rates, through selection of aerosol processing conditions.

  18. Large area sub-micron chemical imaging of magnesium in sea urchin teeth.

    Science.gov (United States)

    Masic, Admir; Weaver, James C

    2015-03-01

    The heterogeneous and site-specific incorporation of inorganic ions can profoundly influence the local mechanical properties of damage tolerant biological composites. Using the sea urchin tooth as a research model, we describe a multi-technique approach to spatially map the distribution of magnesium in this complex multiphase system. Through the combined use of 16-bit backscattered scanning electron microscopy, multi-channel energy dispersive spectroscopy elemental mapping, and diffraction-limited confocal Raman spectroscopy, we demonstrate a new set of high throughput, multi-spectral, high resolution methods for the large scale characterization of mineralized biological materials. In addition, instrument hardware and data collection protocols can be modified such that several of these measurements can be performed on irregularly shaped samples with complex surface geometries and without the need for extensive sample preparation. Using these approaches, in conjunction with whole animal micro-computed tomography studies, we have been able to spatially resolve micron and sub-micron structural features across macroscopic length scales on entire urchin tooth cross-sections and correlate these complex morphological features with local variability in elemental composition. Copyright © 2015 Elsevier Inc. All rights reserved.

  19. Fabrication Techniques for Self-Aligned GaAs-BASED HBTs and Submicron Gate Length FETs

    Science.gov (United States)

    Ren, F.

    Process technologies for self-aligned AlGaAs/GaAs and InGaP/GaAs heterojunction bipolar transistors (HBTs) as well as gate definition and dry etching fabrication schemes for submicron gate length AlGaAs/GaAs-based field effect transistors (FETs) are presented. Multiple energy F+ and H+ ions were used to isolate the active devices for HBTs. The resistance of test wafers at 200° C showed no change over periods of more than 50 days. Highly selective dry and wet etch techniques for InGaP/GaAs and AlGaAs/GaAs material systems were used to uniformly expose heterojunctions. Reliability of the alloyed ohmic contact and feasibility of the nonalloyed ohmic contact metallizations for both p and n type GaAs layers will be discussed. The reproducible gate recess etching is one of the critical steps for AlGaAs/GaAs-based FETs. The etching selectivity, damage, pre- and post-clean procedures were studied in terms of device performance. A simple low temperature SiNx deposition and an etch-back process with optical stepper were used to demonstrate 0.1 µm Y-shape gate feature.

  20. Electron Beam Column Developments for Submicron- and Nanolithography

    Science.gov (United States)

    Gesley, Mark; Abboud, Frank; Colby, Dave; Raymond, Frederick; Watson, Sterling

    1993-12-01

    Recent advances in thermal field emission (TFE) electron beam optics column design for lithography are described. Innovations include source vibration mode mapping, accelerating electron gun lens, gun arc-suppression, automated cathode pyrometer, and experimental deflection control system. Several of these column optics and system enhancements, which improve the accuracy and reliability of MEBES\\textregistered IV-TFE systems, have enabled patterning of 64 Mbit dynamic random access memory (DRAM) 5×-reduction reticles. A 13000-hour cathode lifetime has been achieved in a production environment. Automated column setups over the entire operating range with 99% success and 5 min average times are possible. Blanking at 160 MHz with 30 nm (3σ) critical dimension control is achieved. Data obtained with a new experimental deflection control method can quickly compensate stripe butting drift to high accuracy. Challenges in mask patterning for advanced applications are then considered. Several accuracy and throughput issues for advanced 5× reticles for DRAM, 1× masks, and nanolithography are discussed. Examples are given of scaling recent system data as a means of estimating future error budget components.

  1. A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection

    Energy Technology Data Exchange (ETDEWEB)

    Huh, S.; Ren, L.; Chan, D.; Wurm, S.; Goldberg, K. A.; Mochi, I.; Nakajima, T.; Kishimoto, M.; Ahn, B.; Kang, I.; Park, J.-O.; Cho, K.; Han, S.-I.; Laursen, T.

    2010-03-12

    The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. yet link data is available for understanding native defects on real masks. In this paper, a full-field EUV mask is fabricated to investigate the printability of various defects on the mask. The printability of defects and identification of their source from mask fabrication to handling were studied using wafer inspection. The printable blank defect density excluding particles and patterns is 0.63 cm{sup 2}. Mask inspection is shown to have better sensitivity than wafer inspection. The sensitivity of wafer inspection must be improved using through-focus analysis and a different wafer stack.

  2. 21 CFR 868.5590 - Scavenging mask.

    Science.gov (United States)

    2010-04-01

    ... scavenging mask is a device positioned over a patient's nose to deliver anesthetic or analgesic gases to the upper airway and to remove excess and exhaled gas. It is usually used during dentistry. (b...

  3. Active mask segmentation of fluorescence microscope images.

    Science.gov (United States)

    Srinivasa, Gowri; Fickus, Matthew C; Guo, Yusong; Linstedt, Adam D; Kovacević, Jelena

    2009-08-01

    We propose a new active mask algorithm for the segmentation of fluorescence microscope images of punctate patterns. It combines the (a) flexibility offered by active-contour methods, (b) speed offered by multiresolution methods, (c) smoothing offered by multiscale methods, and (d) statistical modeling offered by region-growing methods into a fast and accurate segmentation tool. The framework moves from the idea of the "contour" to that of "inside and outside," or masks, allowing for easy multidimensional segmentation. It adapts to the topology of the image through the use of multiple masks. The algorithm is almost invariant under initialization, allowing for random initialization, and uses a few easily tunable parameters. Experiments show that the active mask algorithm matches the ground truth well and outperforms the algorithm widely used in fluorescence microscopy, seeded watershed, both qualitatively, as well as quantitatively.

  4. Best focus shift mechanism for thick masks

    Science.gov (United States)

    Burkhardt, Martin; Raghunathan, Ananthan

    2015-03-01

    The best focus shift due to thick mask effects is well known, both in ArF, and more importantly in EUV, where the shorter wavelength is small compared to both mask openings and absorber height. While the effect is stronger in opaque features in clear field masks, the best focus shift is visible in dark field masks as well, and it becomes even more pronounced when scattering bars are added to non-dense features. This pattern dependent focus variation can be predicted in both exact EMF simulations and fast image calculations that are used for optical proximity correction (OPC). Even though this focus shift can be predicted and patterns can be corrected in OPC, we would like to understand the mechanism that causes this focus shift. This can help us understand if, in addition to best focus shift, the image quality is further deteriorated due to the thick mask effects. The best focus shift is found to be an interplay of the complex diffraction coefficient due to thick mask effects and the direction of the light that is incident on the mask, or coherence value σ. A change in focus adds a phase term to each of the complex diffraction coefficients, causing their rotation in a phasor diagram. Best focus is found when the phasors have an angle of 0 or 180 degrees to each other and depending on which diffracted orders are caught in the pupil and contribute to imaging. We investigate the effect of partial coherence, mask thickness, and assist feature placement on best focus shift. We observe a waveguide effect in the absorber gaps because of the reduced real index of refraction in the absorber layer, making vacuum the optically dense medium. We suggest ways to lessen the best focus shifts through assist feature placement or the use of alternative absorbers that are closer matched to the dielectric index of vacuum.

  5. Thorough characterization of an EUV mask

    Science.gov (United States)

    Mizuno, Hiroyuki; McIntyre, Gregory; Koay, Chiew-seng; Burkhardt, Martin; He, Long; Hartley, John; Johnson, Corbet; Raghunathan, Sudharshanan; Goldberg, Kenneth; Mochi, Iacopo; La Fontaine, Bruno; Wood, Obert

    2009-04-01

    We reported that we were successful in our 45nm technology node device demonstration in February 2008 and 22nm node technology node device patterning in February 2009 using ASML's Alpha Demo Tool (ADT).1, 2, 3 In order to insert extreme ultraviolet (EUV) lithography at the 15nm technology node and beyond, we have thoroughly characterized one EUV mask, a so-called NOVACD mask. In this paper, we report on three topics. The first topic is an analysis of line edge roughness (LER) using a mask Scanning Electron Microscope (SEM), an Atomic Force Microscope (AFM) and the Actinic Inspection Tool (AIT) to compare resist images printed with the ASML ADT. The results of the analysis show a good correlation between the mask AFM and the mask SEM measurements. However, the resist printing results for the isolated space patterns are slightly different. The cause of this discrepancy may be resist blur, image log slope and SEM image quality and so on. The second topic is an analysis of mask topography using an AFM and relative reflectivity of mirror and absorber surface using the AIT. The AFM data show 6 and 7 angstrom rms roughness for mirror and absorber, respectively. The reflectivity measurements show that the mirror reflects EUV light about 20 times higher than absorber. The last topic is an analysis of a 32nm technology node SRAM cell which includes a comparison of mask SEM image, AIT image, resist image and simulation results. The ADT images of the SRAM pattern were of high quality even though the mask patters were not corrected for OPC or any EUV-specific effects. Image simulation results were in good agreement with the printing results.

  6. Mask design automation: an integrated approach

    Science.gov (United States)

    Gladhill, Richard; Buck, Peter; Wong, Al

    2012-11-01

    Mask Design, or the process of assembling, arranging and configuring the pattern data required to make a photomask, has many characteristics that make it appropriate for automation, including a high order of complexity, many steps in the process flow, many parameters to define, and multiple flow variants. Traditionally Mask Design has been performed in several discrete steps, each having its own set of tools, processes, data formats, and parameter sets. These include, for example, Boolean layer extraction, fill pattern generation, biasing, Optical Process Compensation (OPC), frame generation (assembling the patterns relevant to reticle and wafer alignment, automated bar code identification, masking/taping borders, process control monitors and test patterns); fracture (transforming design data formats into mask write tool formats); jobdeck generation (creating the mask write tool instruction set); and Mask Rule Checking (MRC). These separate, and often non-compatible, process flows make integration challenging. Additionally, the frame generation process typically has evolved in complexity ad hoc and is often not performed in a systematic manner that makes it easily adaptable to automation.

  7. Attentional dwell times for targets and masks.

    Science.gov (United States)

    Petersen, Anders; Kyllingsbæk, Søren; Bundesen, Claus

    2013-12-06

    Studies on the temporal dynamics of attention have shown that the report of a masked target (T2) is severely impaired when the target is presented with a delay (stimulus onset asynchrony) of less than 500 ms after a spatially separate masked target (T1). This is known as the attentional dwell time. Recently, we have proposed a computational model of this effect building on the idea that a stimulus retained in visual short-term memory (VSTM) takes up visual processing resources that otherwise could have been used to encode subsequent stimuli into VSTM. The resources are locked until the stimulus in VSTM has been recoded, which explains the long dwell time. Challenges for this model and others are findings by Moore, Egeth, Berglan, and Luck (1996) suggesting that the dwell time is substantially reduced when the mask of T1 is removed. Here we suggest that the mask of T1 modulates performance not by noticeably affecting the dwell time but instead by acting as a distractor drawing processing resources away from T2. This is consistent with our proposed model in which targets and masks compete for attentional resources and attention dwells on both. We tested the model by replicating the study by Moore et al., including a new condition in which T1 is omitted but the mask of T1 is retained. Results from this and the original study by Moore et al. are modeled with great precision.

  8. Investigation of an enhanced mask data preparation system using unified mask data formats

    Science.gov (United States)

    Suzuki, Toshio; Kuriyama, Koki; Hirumi, Junji; Yoshioka, Nobuyuki; Kawase, Hidemichi; Kamimoto, Tomoko

    2003-12-01

    Mask data preparation is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have started to develop new mask data format with efficient data compaction and unification among Variable-Shaped-Beam (VSB) EB mask writers. We have proposed the unified mask pattern data format for EB writers named "NEO"1 in the 22nd annual BACUS symposium. We have proposed the unified mask layout format named "MALY" 2 and the high-compression data processing system3 for NEO in Photomask Japan 2003, too. Then we have decided to develop an enhanced mask data preparation system using NEO4 and MALY5. This system has common MDP functions not to be related to each EB writer. That would be effective in reducing mask data handling cost. In this paper we introduce the abstract of NEO and MALY and new mask data preparation system using NEO and MALY.

  9. A thin FinFET Si-fin body structure fabricated with 193-nm scanner photolithography and composite hard mask etching technique upon bulk-Si substrate

    Science.gov (United States)

    Liao, Wen-Shiang; Liu, Yu-Huan; Chang, Wen-Tung; Chen, Tung-Hung; Shih, Tommy; Tsen, Huan-Chiu; Chung, Lee

    2007-03-01

    A thin FinFET bulk Si-fin body structure has been successfully fabricated upon bulk-Si wafers through using 193nm scanner lithography and a composite hard mask etching technique. First, a 100Å-thick buffer SiO II layer was thermally grown upon the bulk silicon layer and subsequently a 1200Å-thick SiN x layer and a 1000Å-thick TEOS SiO II hard mask layer was chemically vapor deposited to form a composite hard mask structure of buffer-SiO II/SiN x/TEOS. Second, both 1050Å-thick BARC and 2650Å-thick photoresist (P/R) were coated and a 193nm scanner lithography tool was used for the Si-fin body layout patterning under relatively high exposure energy. This achieves the ADI (after develop inspection) of 80nm from the original as-drawn Si-fin layout of 110nm. Then, a deep sub-micron plasma etcher was used for an aggressive P/R and BARC trimming down processing and both the capping TEOS and CVD-SiN x with its underlying buffer oxide layers were subsequently etched in other etching plasma chambers, respectively. Resultantly, the AMI (after mask inspection) can reach 60nm. Subsequently, both the P/R and BARC were removed with a nominal plasma ashing as well as a RCA cleaning for the final sub-micron Si-fin plasma etching. Eventually, a 60nm-width and 400nm-height bulk Si-fin body structure can be successfully etched out after a fixed time-mode silicon plasma etching.

  10. Development of a new combinatorial mask for addressable ternary phase diagramming: application to rare earth doped phosphors

    Energy Technology Data Exchange (ETDEWEB)

    Takahashi, R.; Kubota, H.; Tanigawa, T.; Murakami, M.; Yamamoto, Y.; Matsumoto, Y.; Koinuma, H

    2004-02-15

    We report on the computer-aided design of a novel mask for the addressable ternary phase diagram to serve a quick screening of multi-component functional materials. Masking patterns were optimized to make a triangular ternary diagram with each composition changed from 0 to 100% by simulating the deposition process under the condition of synchronous control of the mask motion, target exchange, and laser pulses. Fabrication of a ternary M{sub 0.01}Y{sub 1.99}O{sub 3} (M=Eu, Tm, Tb) phosphor material demonstrates of the direct mapping relationship between the film composition and its cathode luminescence (CL) property.

  11. A nanohybrid system for taste masking of sildenafil

    Science.gov (United States)

    Lee, Ji-Hee; Choi, Goeun; Oh, Yeon-Ji; Park, Je Won; Choy, Young Bin; Park, Mung Chul; Yoon, Yeo Joon; Lee, Hwa Jeong; Chang, Hee Chul; Choy, Jin-Ho

    2012-01-01

    A nanohybrid was prepared with an inorganic clay material, montmorillonite (MMT), for taste masking of sildenafil (SDN). To further improve the taste-masking efficiency and enhance the drug-release rate, we coated the nanohybrid of SDN–MMT with a basic polymer, polyvinylacetal diethylaminoacetate (AEA). Powder X-ray diffraction and Fourier transform infrared experiments showed that SDN was successfully intercalated into the interlayer space of MMT. The AEA-coated SDN–MMT nanohybrid showed drug release was much suppressed at neutral pH (release rate, 4.70 ± 0.53%), suggesting a potential for drug taste masking at the buccal cavity. We also performed in vitro drug release experiments in a simulated gastric fluid (pH = 1.2) and compared the drug-release profiles of AEA-coated SDN–MMT and Viagra®, an approved dosage form of SDN. As a result, about 90% of SDN was released from the AEA-coated SDN–MMT during the first 2 hours while almost 100% of drug was released from Viagra®. However, an in vivo experiment showed that the AEA-coated SDN–MMT exhibited higher drug exposure than Viagra®. For the AEA-coated SDN–MMT, the area under the plasma concentration– time curve from 0 hours to infinity (AUC0-∞) and maximum concentration (Cmax) were 78.8 ± 2.32 μg · hour/mL and 12.4 ± 0.673 μg/mL, respectively, both of which were larger than those obtained with Viagra® (AUC0-∞ = 69.2 ± 3.19 μg · hour/mL; Cmax = 10.5 ± 0.641 μg/mL). Therefore, we concluded that the MMT-based nanohybrid is a promising delivery system for taste masking of SDN with possibly improved drug exposure. PMID:22619517

  12. Submicron Optical Lithography Utilizing A Negative Deep UV Resist MRS

    Science.gov (United States)

    Tomioka, Hideki

    1985-04-01

    A negative deep UV resist MRS is successfully applied to 1:1 projection printings. The MRS has high resolution capability due to the absence of swelling in the developer, and resolves 1 μm patterns. Because of its intense absorption characteristics, the MRS is insensitive to variation in underlayer reflectivity, so the linewidth of the surface part of the MRS is well controlled. A further consequence is image profile variation depending on development 'conditions and resist thickness over steps. Anisotropic etching with high selectivity to resist may mitigate this effect. We are currently applying the MRS to obtain 1 pm-thick Al-Cu-Si metallization patterns realizing 1.5 μm spaces over 0.7 μm stepped substrates by the use of reactive ion etching. The MRS is reliable enough to apply to a single-layer resist process for production of 1.0 μm - 1.5 μm feature size devices. It is found that, using the MRS as a top layer for a tri-layer resist structure, 0.7 μm line and space patterns can be obtained with 1:1 deep UV projection printing. In our tri-layer resist process, the surface part of the MRS acts as a mask to etch the second thin SiO layer, which becomes the final mask pattern of the polymer bottom layer. The MRS tri-layer resist process has excellent resolution and controllability of linewidth compared with that of conventional positive resists.

  13. a New Mask for Automatic Building Detection from High Density Point Cloud Data and Multispectral Imagery

    Science.gov (United States)

    Awrangjeb, M.; Siddiqui, F. U.

    2017-11-01

    In complex urban and residential areas, there are buildings which are not only connected with and/or close to one another but also partially occluded by their surrounding vegetation. Moreover, there may be buildings whose roofs are made of transparent materials. In transparent buildings, there are point returns from both the ground (or materials inside the buildings) and the rooftop. These issues confuse the previously proposed building masks which are generated from either ground points or non-ground points. The normalised digital surface model (nDSM) is generated from the non-ground points and usually it is hard to find individual buildings and trees using the nDSM. In contrast, the primary building mask is produced using the ground points, thereby it misses the transparent rooftops. This paper proposes a new building mask based on the non-ground points. The dominant directions of non-ground lines extracted from the multispectral imagery are estimated. A dummy grid with the target mask resolution is rotated at each dominant direction to obtain the corresponding height values from the non-ground points. Three sub-masks are then generated from the height grid by estimating the gradient function. Two of these sub-masks capture planar surfaces whose height remain constant in along and across the dominant direction, respectively. The third sub-mask contains only the flat surfaces where the height (ideally) remains constant in all directions. All the sub-masks generated in all estimated dominant directions are combined to produce the candidate building mask. Although the application of the gradient function helps in removal of most of the vegetation, the final building mask is obtained through removal of planar vegetation, if any, and tiny isolated false candidates. Experimental results on three Australian data sets show that the proposed method can successfully remove vegetation, thereby separate buildings from occluding vegetation and detect buildings with

  14. The Intervenor Effect in Masked Priming: How Does Masked Priming Survive across an Intervening Word?

    Science.gov (United States)

    Forster, Kenneth I.

    2009-01-01

    Four masked priming experiments are reported investigating the effect of inserting an unrelated word between the masked prime and the target. When the intervening word is visible, identity priming is reduced to the level of one-letter-different form priming, but form priming is largely unaffected. However, when the intervening word is itself…

  15. [Rare problem with the insertion of a Supreme™ laryngeal mask airway device. Case of the trimester].

    Science.gov (United States)

    2014-03-01

    A breast tumor was resected under general anesthesia. After induction, the airway was managed with a Supreme™ laryngeal mask airway device. The insertion of the laryngeal mask airway device, the insertion of the orogastric tube through the drain tube, as well as the mechanical ventilation, were very difficult from the beginning. On removing the laryngeal mask airway device to solve the problem, it was observed that the drain tube was broken, and the orogastric tube had passed into the anterior, laryngeal part of the device through the split. It was later found out that the laryngeal mask airway device, as well as the whole manufacturing batch, had suffered a design modification: the cuff was constructed with a softer material without reinforcement in the tip, and the drain tube had a heat-sealing defect that facilitated the break. The incident was reported to the local supplier and the manufacturer, and the defective batch of laryngeal mask airway devices was recalled. The incident was also reported to other hospitals via SENSAR, to warn other users of the potential dangers of the design modification in the Supreme™ laryngeal mask airway. Copyright © 2013 Sociedad Española de Anestesiología, Reanimación y Terapéutica del Dolor. Published by Elsevier España. All rights reserved.

  16. 193-nm radiation durability study of MoSi binary mask and resulting lithographic performance

    Science.gov (United States)

    Servin, Isabelle; Belledent, Jérôme; Pain, Laurent; Connolly, Brid; Sczyrba, Martin; Lamantia, Matt

    2011-05-01

    Dimensions on mask continue to shrink to keep up with the ITRS roadmap. This has implications on the material of choice for the blanks. For example, the new binary OMOG stack (Opaque MOSi on Glass) was successfully introduced to meet the mask specifications at the 32nm technology node. Obviously 193-nm optical lithography will be further used in production at even higher NA and lower k1 emphasizing, for example, the impact on wafer of any electromagnetic field migration effects. Indeed, long term radiation damage inducing CD growth and consequently, device yield loss, has already been reported [1, 2]. This mechanism, known as Electric Field induced Migration of chrome (EMF) often shortens the mask's lifetime. Here, a study was conducted to investigate the impact of intensive ArF scanner exposure both on final wafer and mask performances. The Si printed wafers measured with top-down CD-SEM were characterized with respect to CD uniformity, linearity, Sub Resolution Assist Feature (SRAF) printability through process window, MEEF, DOF, and OPC accuracy. The data was also correlated to advanced mask inspection results (e.g. AIMSTM) taken at the same location. More precisely, this work follows a preliminary study [1] which pointed out that OMOG is less sensitive to radiation than standard COG (Chrome On Glass). And, in this paper, we report on results obtained at higher energy to determine the ultimate lifetime of OMOG masks.

  17. Flavored Anesthetic Masks for Inhalational Induction in Children.

    Science.gov (United States)

    Gupta, Aakriti; Mathew, Preethy Joseph; Bhardwaj, Neerja

    2017-10-01

    To evaluate the clinical efficacy of masking the odor of inhalational agents using fruit flavors on the anxiety behavior and compliance of children for inhalational induction. A prospective randomized double blind, placebo controlled study was conducted on 60 unpremedicated children in the age group of 4-12 y. Thirty children received anesthetic masks smeared with a flavor of child's choice while the other 30 children were induced using masks without flavor. Anxiety was assessed using modified Yale Pre-operative Anxiety Scale (mYPAS) in the pre-op room and during inhalational induction. Mask acceptance was graded by Induction Compliance Checklist (ICC). The cost-effectiveness of flavored anesthetic masks was compared to that of commercially available pre-scented masks. The baseline anxiety in the two groups was comparable. The number of children demonstrating high levels of anxiety at anesthetic induction was similar in flavored and non-flavored mask groups (p 0.45). The compliance to mask induction was also equally good (p 0.99). The authors found significant difference in the cost of flavored mask (INR 56.45 per mask) as compared to commercially available pre-scented masks (INR 660 per mask). The authors observed a placebo effect that reduced the pre-op anxiety in the control group which probably made the quality of induction equivalent with flavored and non-flavored masks. Therefore, using a flavored anesthetic mask is cost-effective than using a commercially available pre-scented mask.

  18. Breaking camouflage: binocular disparity reduces contrast masking in natural images.

    Science.gov (United States)

    Wardle, Susan G; Cass, John; Brooks, Kevin R; Alais, David

    2010-12-31

    Visual overlay masking is typically studied with a mask and target located at the same depth plane. Masking is reduced when binocular disparity separates the target from the mask (G. Moraglia & B. Schneider, 1990). We replicate this finding for a broadband target masked by natural images and find the greatest masking (threshold elevation) when target and mask occupy the same depth plane. Masking was reduced equally whether the target appeared at a crossed or an uncrossed disparity. We measure the tuning of masking and determine the extent of the benefit afforded by disparity. Threshold elevation decreases monotonically with increasing disparity until ±8 arcmin. Two underlying components to the masking are evident; one accounts for around two-thirds of the masking and is independent of disparity. The second component is disparity-dependent and results in additional masking when there is zero disparity. Importantly, the reduction in masking with disparity cannot be explained by interocular decorrelation; we use a single-interval orientation discrimination task to exclude this possibility. We conclude that when the target and mask are presented at different depths they activate distinct populations of disparity-tuned neurons, resulting in less masking of the target.

  19. Fabrication and characterization of submicron polymer waveguides by micro-transfer molding

    Energy Technology Data Exchange (ETDEWEB)

    Wu, Te-Wei [Iowa State Univ., Ames, IA (United States)

    2009-01-01

    Various methods exist for fabrication of micron and submicron sized waveguide structures. However, most of them include expensive and time consuming semiconductor fabrication techniques. An economical method for fabricating waveguide structures is introduced and demonstrated in this thesis. This method is established based on previously well-developed photonic crystal fabrication method called two-polymer microtransfer molding. The waveguide in this work functions by a coupler structure that diffracts the incident light into submicron polymer rods. The light is then guided through the rods. Characterization is done by collecting the light that has been guided through the waveguide and exits the end of these submicron polymer bars. The coupling and waveguiding capabilities are demonstrated using two light sources, a laser and white light.

  20. Mitigating mask roughness via pupil filtering

    Science.gov (United States)

    Baylav, B.; Maloney, C.; Levinson, Z.; Bekaert, J.; Vaglio Pret, A.; Smith, B.

    2014-03-01

    The roughness present on the sidewalls of lithographically defined patterns imposes a very important challenge for advanced technology nodes. It can originate from the aerial image or the photoresist chemistry/processing [1]. The latter remains to be the dominant group in ArF and KrF lithography; however, the roughness originating from the mask transferred to the aerial image is gaining more attention [2-9], especially for the imaging conditions with large mask error enhancement factor (MEEF) values. The mask roughness contribution is usually in the low frequency range, which is particularly detrimental to the device performance by causing variations in electrical device parameters on the same chip [10-12]. This paper explains characteristic differences between pupil plane filtering in amplitude and in phase for the purpose of mitigating mask roughness transfer under interference-like lithography imaging conditions, where onedirectional periodic features are to be printed by partially coherent sources. A white noise edge roughness was used to perturbate the mask features for validating the mitigation.

  1. Stencil mask technology for ion beam lithography

    Science.gov (United States)

    Ehrmann, Albrecht; Huber, Sabine; Kaesmaier, Rainer; Oelmann, Andreas B.; Struck, Thomas; Springer, Reinhard; Butschke, Joerg; Letzkus, Florian; Kragler, Karl; Loeschner, Hans; Rangelow, Ivo W.

    1998-12-01

    Ion beam lithography is one of the most promising future lithography technologies. A helium or hydrogen ion beam illuminates a stencil membrane mask and projects the image with 4X reduction to the wafer. The development of stencil masks is considered to be critical for the success of the new technology. Since 1997, within the European Ion Projection Lithography MEDEA (Microelectronic Devices for European Applications) project silicon stencil masks based on a wafer- flow process are developed. They are produced in a conventional wafer line. Six inch SOI (silicon-on-insulator) wafers are patterned with an e-beam wafer writing tool, then trenches are etched by plasma etching. Afterwards, the membrane is etched by wet etch using the SOI-oxide layer as an etch stop. The last step is to add a coating layer, which is sputtered onto the membrane. It protects the mask against ion irradiation damage. For metrology and inspection, methods used for conventional chromium masks as well as new techniques are investigated. Results from placement measurements on the Leica LMS IPRO tool will be presented. Finally, methods for CD measurement, defect inspection, repair and in-situ-cleaning in the stepper will be discussed, including experimental information of first tests.

  2. Mask and lithography techniques for FPD

    Science.gov (United States)

    Sandstrom, T.; Wahlsten, M.; Sundelin, E.; Hansson, G.; Svensson, A.

    2015-09-01

    Large-field projection lithography for FPDs has developed gradually since the 90s. The LCD screen technology has remained largely unchanged and incremental development has given us better image quality, larger screen sizes, and above all lower cost per area. Recently new types of mobile devices with very high pixel density and/or OLED displays have given rise to dramatically higher requirem ents on photomask technology. Devices with 600 ppi or m ore need lithography with higher optical resolution and better linewidth control. OLED di splays pose new challenges with high sensitivity to transistor parameters and to capacitive cross-talk. New mask requirements leads to new maskwriter requirements and Mycronic has developed a new generation of large -area mask writers with significantly improved properties. This paper discusses and shows data for the improved writers. Mask production to high er quality stan dards also need metrology to verify the quality and Mycronic has introduced a 2D metrology tool with accuracy adequate for current and future masks. New printing or additive methods of producing disp lays on plastic or metal foil will make low-cost disp lays available. This inexpensive type of disp lays will exist side by side with the photographic quality displays of TVs and mobile devices, which will continue to be a challenge in terms of mask and production quality.

  3. EUV mask process specifics and development challenges

    Science.gov (United States)

    Nesladek, Pavel

    2014-07-01

    EUV lithography is currently the favorite and most promising candidate among the next generation lithography (NGL) technologies. Decade ago the NGL was supposed to be used for 45 nm technology node. Due to introduction of immersion 193nm lithography, double/triple patterning and further techniques, the 193 nm lithography capabilities was greatly improved, so it is expected to be used successfully depending on business decision of the end user down to 10 nm logic. Subsequent technology node will require EUV or DSA alternative technology. Manufacturing and especially process development for EUV technology requires significant number of unique processes, in several cases performed at dedicated tools. Currently several of these tools as e.g. EUV AIMS or actinic reflectometer are not available on site yet. The process development is done using external services /tools with impact on the single unit process development timeline and the uncertainty of the process performance estimation, therefore compromises in process development, caused by assumption about similarities between optical and EUV mask made in experiment planning and omitting of tests are further reasons for challenges to unit process development. Increased defect risk and uncertainty in process qualification are just two examples, which can impact mask quality / process development. The aim of this paper is to identify critical aspects of the EUV mask manufacturing with respect to defects on the mask with focus on mask cleaning and defect repair and discuss the impact of the EUV specific requirements on the experiments needed.

  4. Materialism.

    Science.gov (United States)

    Melnyk, Andrew

    2012-05-01

    Materialism is nearly universally assumed by cognitive scientists. Intuitively, materialism says that a person's mental states are nothing over and above his or her material states, while dualism denies this. Philosophers have introduced concepts (e.g., realization and supervenience) to assist in formulating the theses of materialism and dualism with more precision, and distinguished among importantly different versions of each view (e.g., eliminative materialism, substance dualism, and emergentism). They have also clarified the logic of arguments that use empirical findings to support materialism. Finally, they have devised various objections to materialism, objections that therefore serve also as arguments for dualism. These objections typically center around two features of mental states that materialism has had trouble in accommodating. The first feature is intentionality, the property of representing, or being about, objects, properties, and states of affairs external to the mental states. The second feature is phenomenal consciousness, the property possessed by many mental states of there being something it is like for the subject of the mental state to be in that mental state. WIREs Cogn Sci 2012, 3:281-292. doi: 10.1002/wcs.1174 For further resources related to this article, please visit the WIREs website. Copyright © 2012 John Wiley & Sons, Ltd.

  5. Improved Mask Protected DES using RSA Algorithm

    Directory of Open Access Journals (Sweden)

    Asha Latha S.

    2016-01-01

    Full Text Available The data encryption standard is a pioneering and farsighted standard which helped to set a new paradigm for encryption standards. But now DES is considered to be insecure for some application. Asymmetric mask protected DES is an advanced encryption method for effectively protecting the advanced DES. There are still probabilities to improve its security. This paper propose a method, which introduce a RSA key generation scheme in mask protected DES instead of plain key, which result in enhancement in the security of present asymmetric mask protected DES. We further propose a Vedic mathematical method of RSA implementation which reduce the complexity of computation in RSA block thereby resulting in reduced delay (four timesthat improves the performance of overall system. The software implementation was performed using Xilinx 13.2 and Model-Sim was used for the simulation environment.

  6. Polymer Masks for nanostructuring of graphene

    DEFF Research Database (Denmark)

    Shvets, Violetta

    This PhD project is a part of Center for Nanostructured Graphene (CNG) activities. The aim of the project is to develop a new lithography method for creation of highly ordered nanostructures with as small as possible feature and period sizes. The method should be applicable for graphene...... polymer masks is developed. Mask fabrication is realized by microtoming of 30-60 nm thin sections from pre-aligned polymer monoliths with different morphologies. The resulting polymer masks are then transferred to both silicon and graphene substrates. Hexagonally packed hole patterns with 10 nm hole...... diameter and 20 nm periodicity are successfully transferred to both substrates. The method allowed to realize the first ever transfer of moiré patterns to silicon. Furthermore, in collaboration with CNG, device with nanostructured graphene are fabricated and electrical measurements made on these devices...

  7. Particle arrays with patterned pores by nanomachining with colloidal masks.

    Science.gov (United States)

    Choi, Dae-Geun; Kim, Sarah; Lee, Eeunsug; Yang, Seung-Man

    2005-02-16

    In summary, we have developed a new strategy for the fabrication of arrayed colloidal particles well-ordered nanometric holes of three or four fold symmetry by anisotropic reactive ion (plasma) etching of self-organized layers of colloidal spheres. We demonstrated that a mesoporous silica matrix with regular open windows could be used as a lithographic mask and the resulting arrangement of pores on a particle was dependent on the orientation of the colloidal particle stacking. A variety of organic and inorganic materials such as metals for metal-polymer composites, DNA and proteins, semiconducting and ceramic materials, and other polymers and small chemicals can be incorporated via chemical and physical attachment. Particles with patterned pores and composite particles by our nanomachining process can be used as novel functional materials in the field of electronics, photonics, and biotech areas.

  8. Size-Dependent Photodynamic Anticancer Activity of Biocompatible Multifunctional Magnetic Submicron Particles in Prostate Cancer Cells

    Directory of Open Access Journals (Sweden)

    Kyong-Hoon Choi

    2016-09-01

    Full Text Available In this study, newly designed biocompatible multifunctional magnetic submicron particles (CoFe2O4-HPs-FAs of well-defined sizes (60, 133, 245, and 335 nm were fabricated for application as a photosensitizer delivery agent for photodynamic therapy in cancer cells. To provide selective targeting of cancer cells and destruction of cancer cell functionality, basic cobalt ferrite (CoFe2O4 particles were covalently bonded with a photosensitizer (PS, which comprises hematoporphyrin (HP, and folic acid (FA molecules. The magnetic properties of the CoFe2O4 particles were finely adjusted by controlling the size of the primary CoFe2O4 nanograins, and secondary superstructured composite particles were formed by aggregation of the nanograins. The prepared CoFe2O4-HP-FA exhibited high water solubility, good MR-imaging capacity, and biocompatibility without any in vitro cytotoxicity. In particular, our CoFe2O4-HP-FA exhibited remarkable photodynamic anticancer efficiency via induction of apoptotic death in PC-3 prostate cancer cells in a particle size- and concentration-dependent manner. This size-dependent effect was determined by the specific surface area of the particles because the number of HP molecules increased with decreasing size and increasing surface area. These results indicate that our CoFe2O4-HP-FA may be applicable for photodynamic therapy (PDT as a PS delivery material and a therapeutic agent for MR-imaging based PDT owing to their high saturation value for magnetization and superparamagnetism.

  9. Physical properties of an oxide photoresist film for submicron pattern lithography

    Energy Technology Data Exchange (ETDEWEB)

    Chiang, Donyau [Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, 30076, Taiwan (China); Chang, Chun-Ming [Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu, 30076, Taiwan (China); Department of Engineering Science and Ocean Engineering, National Taiwan University, Taipei, 10617, Taiwan (China); Chen, Shi-Wei [Nano Science Group, Scientific Research Division, National Synchrotron Radiation Research Center, Hsinchu, 30076, Taiwan (China); Yang, Chin-Tien [Nanotechnology Research Center, Industrial Technology Research Institute, Hsinchu, 31040, Taiwan (China); Hsueh, Wen-Jeng [Department of Engineering Science and Ocean Engineering, National Taiwan University, Taipei, 10617, Taiwan (China)

    2013-09-02

    The minimum etched pits of 300 nm diameter and the trenches of 300 nm width with a 50 nm depth for both geometries are prepared in the GeSbSn oxide photoresist on the silicon substrates. The lithographic patterns are recorded by direct laser writing, using a 405 nm laser diode and 0.9 numerical aperture media disc mastering system. The developed pit diameters in an inorganic oxide photoresist are smaller than the exposed laser beam spot diameter due to thermal lithography. The crystal structures of the as-sputtered and the annealed powder samples scraped from the sputtered films are examined by X-ray diffractometer. The effect of the heating rate on the crystallization temperatures is evaluated by a differential scanning calorimeter and the crystallization activation energy is determined from Kissinger's plot. The optical and absorption characteristics of the oxides are strongly dependent on the oxygen flow rate during the reactive magnetron sputtering process. The transmittance of the deposited films increases and the absorption decreases with increasing oxygen flow rate, which implies that at high oxygen flow rate, the film resembles dielectric material. The oxygen flow rate during the deposition process is defined within a limited range to obtain the proper extinction coefficient. The working extinction coefficients of the films ranging from 0.5 to 0.8 are applied in this study to achieve the sharp and vertical edge of the etched pits and trenches of 50 nm depth. - Highlights: • A photoresist layer consisting GeSbSnO with submicron patterning for optical device applications. • The thermal, optical properties and crystallization behaviors are reported. • A better working extinction coefficient ranges are decided experimentally. • The ranges define minimum size of the etched marks with smooth boundary. • Thermal lithography concept is introduced to explain experimental results.

  10. Anthropogenic influences on the physical state of submicron particulate matter over a tropical forest

    Energy Technology Data Exchange (ETDEWEB)

    Bateman, Adam P.; Gong, Zhaoheng; Harder, Tristan H.; de Sá, Suzane S.; Wang, Bingbing; Castillo, Paulo; China, Swarup; Liu, Yingjun; O& amp; apos; Brien, Rachel E.; Palm, Brett B.; Shiu, Hung-Wei; Cirino, Glauber G.; Thalman, Ryan; Adachi, Kouji; Alexander, M. Lizabeth; Artaxo, Paulo; Bertram, Allan K.; Buseck, Peter R.; Gilles, Mary K.; Jimenez, Jose L.; Laskin, Alexander; Manzi, Antonio O.; Sedlacek, Arthur; Souza, Rodrigo A. F.; Wang, Jian; Zaveri, Rahul; Martin, Scot T.

    2017-02-06

    The occurrence of nonliquid and liquid physical states of submicron atmospheric particulate matter (PM) downwind of an urban region in central Amazonia was investigated. Measurements were conducted during two intensive operating periods (IOP1 and IOP2) that took place during the wet and dry seasons of the GoAmazon2014/5 campaign. Air masses representing variable influences of background conditions, urban pollution, and regional- and continental-scale biomass burning passed over the research site. As the air masses varied, particle rebound fraction, an indicator of physical state, was measured in real time at ground level using an impactor apparatus. Micrographs collected by transmission electron microscopy confirmed that liquid particles adhered, while nonliquid particles rebounded. Relative humidity (RH) was scanned to collect rebound curves. When the apparatus RH matched ambient RH, 95 % of the particles adhered as a campaign average. Secondary organic material, produced for the most part by the oxidation of volatile organic compounds emitted from the forest, produces liquid PM over this tropical forest. During periods of anthropogenic influence, by comparison, the rebound fraction dropped to as low as 60 % at 95 % RH. Analyses of the mass spectra of the atmospheric PM by positive-matrix factorization (PMF) and of concentrations of carbon monoxide, total particle number, and oxides of nitrogen were used to identify time periods affected by anthropogenic influences, including both urban pollution and biomass burning. The occurrence of nonliquid PM at high RH correlated with these indicators of anthropogenic influence. A linear model having as output the rebound fraction and as input the PMF factor loadings explained up to 70 % of the variance in the observed rebound fractions. Anthropogenic influences can contribute to the presence of nonliquid PM in the atmospheric particle population through the combined effects of molecular species that increase viscosity

  11. Metacontrast masking is processed before grapheme-color synesthesia.

    Science.gov (United States)

    Bacon, Michael Patrick; Bridgeman, Bruce; Ramachandran, Vilayanur S

    2013-01-01

    We investigated the physiological mechanism of grapheme-color synesthesia using metacontrast masking. A metacontrast target is rendered invisible by a mask that is delayed by about 60 ms; the target and mask do not overlap in space or time. Little masking occurs, however, if the target and mask are simultaneous. This effect must be cortical, because it can be obtained dichoptically. To compare the data for synesthetes and controls, we developed a metacontrast design in which nonsynesthete controls showed weaker dichromatic masking (i.e., the target and mask were in different colors) than monochromatic masking. We accomplished this with an equiluminant target, mask, and background for each observer. If synesthetic color affected metacontrast, synesthetes should show monochromatic masking more similar to the weak dichromatic masking among controls, because synesthetes could add their synesthetic color to the monochromatic condition. The target-mask pairs used for each synesthete were graphemes that elicited strong synesthetic colors. We found stronger monochromatic than dichromatic U-shaped metacontrast for both synesthetes and controls, with optimal masking at an asynchrony of 66 ms. The difference in performance between the monochromatic and dichromatic conditions in the synesthetes indicates that synesthesia occurs at a later processing stage than does metacontrast masking.

  12. Preparation of a Novel Nano or Submicron Tourmaline Ceramic and Its Ability to Inhibit the Activity of the Sulfate-Reducing Bacterium

    Science.gov (United States)

    Li, Chun-ying

    2017-07-01

    In this study, novel nano- or submicron-scale tourmaline bacteriostatic ceramics in which nano or submicron tourmaline is one of the central materials, together with nano-zinc oxide, are prepared using ion exchange and solid-phase synthesis techniques. The material is then examined with IR, XRD and XPS and is tested for the ability to inhibit the activity of the sulfate-reducing bacterium (SRB). The calcination temperature of the ceramic is 600 °C, and the main components are present at 11.17% for Si2p, 3.12% for Mo3d, 3.47% for Zn2p3, 2.86% for Mn2p and 2.35% for Cu2p. Additionally, the density of this material is 1.4-3.5 g/cm3, and its compressive strength exceeds 5.2 MPa, meeting the requirements of ceramic standards. Consequently, the bacteriostatic ceramic inhibits the activity of the sulfate-reducing bacterium effectively without inhibiting the removal of COD and NO3 -. These results indicate that the sulfate-reducing bacterium maintains its functional metabolism, apart from its sulfate reduction potential, when using this bacteriostatic ceramic, thus achieving the goal of inhibiting the action of the sulfate-reducing bacterium.

  13. Carbon contamination topography analysis of EUV masks

    Energy Technology Data Exchange (ETDEWEB)

    Fan, Y.-J.; Yankulin, L.; Thomas, P.; Mbanaso, C.; Antohe, A.; Garg, R.; Wang, Y.; Murray, T.; Wuest, A.; Goodwin, F.; Huh, S.; Cordes, A.; Naulleau, P.; Goldberg, K. A.; Mochi, I.; Gullikson, E.; Denbeaux, G.

    2010-03-12

    The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

  14. Cosmic Ballet or Devil's Mask?

    Science.gov (United States)

    2004-04-01

    Stars like our Sun are members of galaxies, and most galaxies are themselves members of clusters of galaxies. In these, they move around among each other in a mostly slow and graceful ballet. But every now and then, two or more of the members may get too close for comfort - the movements become hectic, sometimes indeed dramatic, as when galaxies end up colliding. ESO PR Photo 12/04 shows an example of such a cosmic tango. This is the superb triple system NGC 6769-71, located in the southern Pavo constellation (the Peacock) at a distance of 190 million light-years. This composite image was obtained on April 1, 2004, the day of the Fifth Anniversary of ESO's Very Large Telescope (VLT). It was taken in the imaging mode of the VIsible Multi-Object Spectrograph (VIMOS) on Melipal, one of the four 8.2-m Unit Telescopes of the VLT at the Paranal Observatory (Chile). The two upper galaxies, NGC 6769 (upper right) and NGC 6770 (upper left), are of equal brightness and size, while NGC 6771 (below) is about half as bright and slightly smaller. All three galaxies possess a central bulge of similar brightness. They consist of elderly, reddish stars and that of NGC 6771 is remarkable for its "boxy" shape, a rare occurrence among galaxies. Gravitational interaction in a small galaxy group NGC 6769 is a spiral galaxy with very tightly wound spiral arms, while NGC 6770 has two major spiral arms, one of which is rather straight and points towards the outer disc of NGC 6769. NGC 6770 is also peculiar in that it presents two comparatively straight dark lanes and a fainter arc that curves towards the third galaxy, NGC 6771 (below). It is also obvious from this new VLT photo that stars and gas have been stripped off NGC 6769 and NGC 6770, starting to form a common envelope around them, in the shape of a Devil's Mask. There is also a weak hint of a tenuous bridge between NGC 6769 and NGC 6771. All of these features testify to strong gravitational interaction between the three galaxies

  15. A scavenging double mask to reduce workplace contamination during mask induction of inhalation anesthesia in dogs

    Directory of Open Access Journals (Sweden)

    Säre Heli

    2011-01-01

    Full Text Available Abstract Background Workplace contamination by the use of volatile anesthetic agents should be kept to a minimum if a potential health hazard is to be minimised. Mask induction of animals is a common procedure. The present study investigates the efficiency of a novel scavenging double mask in reducing waste gas concentrations in the breathing zone of the anesthetist performing this procedure. Methods Twelve beagle dogs (ASA I undergoing general anesthesia for a dental procedure were intravenously premedicated with medetomidine and butorphanol (10 μg/kg and 0.2 mg/kg. Anesthesia was induced via a custom-made scavenging mask using isoflurane in oxygen. In six dogs (group S, scavenging from the mask was performed whereas in six other dogs (group NS the scavenging function was disabled. Isoflurane concentration was continuously measured with photoacoustic spectroscopy at the level of the shoulder of the anesthetist before and during mask induction and additionally during intubation. Statistical analysis was performed with a Student t- test and a Mann-Whitney U test (p Results The mean isoflurane concentration during baseline (premedication was 1.8 ± 0.8 ppm and 2.3 ± 0.6 ppm in group S and NS respectively. This increased during mask induction to 2.0 ± 0.8 ppm and 11.2 ± 6.0 ppm respectively (p Conclusion This double mask can be used to induce inhalation anesthesia in dogs. Scavenging from the mask significantly decreases the amount of waste anaesthetic gas concentrations in the breathing zone of the anesthetist. Therefore, such a system can be recommended whenever induction or maintenance of general anesthesia by mask is considered.

  16. High quality mask storage in an advanced Logic-Fab

    Science.gov (United States)

    Jähnert, Carmen; Fritsche, Silvio

    2012-02-01

    High efficient mask logistics as well as safe and high quality mask storage are essential requirements within an advanced lithography area of a modern logic waferfab. Fast operational availability of the required masks at the exposure tool with excellent mask condition requires a safe mask handling, safeguarding of high mask quality over the whole mask usage time without any quality degradation and an intelligent mask logistics. One big challenge is the prevention of haze on high advanced phase shift masks used in a high volume production line for some thousands of 248nm or 193nm exposures. In 2008 Infineon Dresden qualified a customer specific developed semi-bare mask storage system from DMSDynamic Micro Systems in combination with a high advanced mask handling and an interconnected complex logistic system. This high-capacity mask storage system DMS M1900.22 for more than 3000 masks with fully automated mask and box handling as well as full-blown XCDA purge has been developed and adapted to the Infineon Lithotoollandscape using Nikon and SMIF reticle cases. Advanced features for ESD safety and mask security, mask tracking via RFID and interactions with the exposure tools were developed and implemented. The stocker is remote controlled by the iCADA-RSM system, ordering of the requested mask directly from the affected exposure tool allows fast access. This paper discusses the advantages and challenges for this approach as well as the practical experience gained during the implementation of the new system which improves the fab performance with respect to mask quality, security and throughput. Especially the realization of an extremely low and stable humidity level in addition with a well controlled air flow at each mask surface, preventing masks from haze degradation and particle contamination, turns out to be a notable technical achievement. The longterm stability of haze critical masks has been improved significantly. Relevant environmental parameters like

  17. Optimisation of microencapsulation of turmeric extract for masking flavour.

    Science.gov (United States)

    Laokuldilok, Natcha; Thakeow, Prodpran; Kopermsub, Phikunthong; Utama-ang, Niramon

    2016-03-01

    The aim of this study was to evaluate the odour masking property, encapsulation efficiency and physicochemical properties of turmeric extract prepared by a binary blend of wall materials, i.e. brown rice flour (BRF) and beta-cyclodextrin (β-CD). Response surface methodology was applied to investigate the effect of encapsulation processing variables, including core loading mass (5-25%) and β-CD (5-20%) concentration on product recovery, moisture content, hygroscopicity, curcuminoids encapsulation and volatile release. To investigate odour masking properties of a wall material combination, volatiles in headspace were monitored by GC-MS using ar-turmerone and 2-methyl-4-vinylguaiacol as marker compounds to represent turmeric extract. The obtained results revealed an optimal encapsulation process was 5% of core loading mass with addition 20g/L of β-CD, since it enabled high curcuminoids encapsulation with low volatile release, moisture content and hygroscopicity. Turmeric powder with reduced odour can be used as a nutrient supplement or natural colorant for food products. Copyright © 2015 Elsevier Ltd. All rights reserved.

  18. Oronasal Masks Require a Higher Pressure than Nasal and Nasal Pillow Masks for the Treatment of Obstructive Sleep Apnea.

    Science.gov (United States)

    Deshpande, Sheetal; Joosten, Simon; Turton, Anthony; Edwards, Bradley A; Landry, Shane; Mansfield, Darren R; Hamilton, Garun S

    2016-09-15

    Oronasal masks are frequently used for continuous positive airway pressure (CPAP) treatment in patients with obstructive sleep apnea (OSA). The aim of this study was to (1) determine if CPAP requirements are higher for oronasal masks compared to nasal mask interfaces and (2) assess whether polysomnography and patient characteristics differed among mask preference groups. Retrospective analysis of all CPAP implementation polysomnograms between July 2013 and June 2014. Prescribed CPAP level, polysomnography results and patient data were compared according to mask type (n = 358). Oronasal masks were used in 46%, nasal masks in 35% and nasal pillow masks in 19%. There was no difference according to mask type for baseline apnea-hypopnea index (AHI), body mass index (BMI), waist or neck circumference. CPAP level was higher for oronasal masks, 12 (10-15.5) cm H2O compared to nasal pillow masks, 11 (8-12.5) cm H2O and nasal masks, 10 (8-12) cm H2O, p pillow mask. Residual median AHI was higher for oronasal masks (11.3 events/h) than for nasal masks (6.4 events/h) and nasal pillows (6.7 events/h), p < 0.001. Compared to nasal mask types, oronasal masks are associated with higher CPAP pressures (particularly pressures ≥ 15 cm H2O) and a higher residual AHI. Further evaluation with a randomized control trial is required to definitively establish the effect of mask type on pressure requirements. A commentary on this article appears in this issue on page 1209. © 2016 American Academy of Sleep Medicine.

  19. The efficiency and stability of bubble formation by acoustic vaporization of submicron perfluorocarbon droplets

    NARCIS (Netherlands)

    Reznik, Nikita; Shpak, O.; Gelderblom, E.C.; Williams, Ross; de Jong, N.; Versluis, Andreas Michel; Burns, Peter N.

    2013-01-01

    Submicron droplets of liquid perfluorocarbon converted into microbubbles with applied ultrasound have been studied, for a number of years, as potential next generation extravascular ultrasound contrast agents. In this work, we conduct an initial ultra-high-speed optical imaging study to examine the

  20. Analysis and Design of Monolithic Inductors in Sub-micron CMOS

    DEFF Research Database (Denmark)

    Fallesen, Carsten; Jørgensen, Allan

    1997-01-01

    In the last few years the CMOS processes have gone into deep sub-micron channel lengths. This means that it is now possible to make GHz applications in CMOS. In analog GHz applications it is often necessary to have access to inductors. This report describes the development of a physical model of ...

  1. A Comprehensive Evaluation of Nanoparticle Tracking Analysis (NanoSight) for Characterization of Proteinaceous Submicron Particles

    NARCIS (Netherlands)

    Tian, X.; Nejadnik, M.R.; Baunsgaard, D.; Henriksen, A.; Rischel, C.; Jiskoot, W.

    2016-01-01

    Nanoparticle tracking analysis (NTA) has attracted great interest for application in the field of submicron particle characterization for biopharmaceuticals. It has the virtue of direct sample visualization and particle-by-particle tracking, but the complexity of method development has limited its

  2. Thermophoretic motion behavior of submicron particles in boundary-layer-separation flow around a droplet.

    Science.gov (United States)

    Wang, Ao; Song, Qiang; Ji, Bingqiang; Yao, Qiang

    2015-12-01

    As a key mechanism of submicron particle capture in wet deposition and wet scrubbing processes, thermophoresis is influenced by the flow and temperature fields. Three-dimensional direct numerical simulations were conducted to quantify the characteristics of the flow and temperature fields around a droplet at three droplet Reynolds numbers (Re) that correspond to three typical boundary-layer-separation flows (steady axisymmetric, steady plane-symmetric, and unsteady plane-symmetric flows). The thermophoretic motion of submicron particles was simulated in these cases. Numerical results show that the motion of submicron particles around the droplet and the deposition distribution exhibit different characteristics under three typical flow forms. The motion patterns of particles are dependent on their initial positions in the upstream and flow forms. The patterns of particle motion and deposition are diversified as Re increases. The particle motion pattern, initial position of captured particles, and capture efficiency change periodically, especially during periodic vortex shedding. The key effects of flow forms on particle motion are the shape and stability of the wake behind the droplet. The drag force of fluid and the thermophoretic force in the wake contribute jointly to the deposition of submicron particles after the boundary-layer separation around a droplet.

  3. A new mask exposure and analysis facility

    NARCIS (Netherlands)

    Sligte, E. te; Koster, N.B.; Deutz, A.F.; Staring, W.P.M.

    2014-01-01

    The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at

  4. Puppets and Masks: Stagecraft and Storytelling.

    Science.gov (United States)

    Rump, Nan

    This teaching resource provides practical information and activities for involving elementary students in storytelling arts projects. The projects are designed to encourage experimentation with dramatic communication through gesture and body language while wearing masks, manipulating puppets, and moving interactive scenery. Ten chapters are…

  5. Shared neighborhood effects in masked orthographic priming

    NARCIS (Netherlands)

    Heuven, W.J.B. van; Dijkstra, A.F.J.; Grainger, J.; Schriefers, H.J.

    2001-01-01

    Several studies have found effects of orthographically related masked nonword primes on lexical decisions to target words. These effects have been explained by the neighborhood characteristics of the target word (Forster, 1987), but the neighborhood characteristics of the prime in combination with

  6. Central auditory masking by an illusory tone.

    Science.gov (United States)

    Plack, Christopher J; Oxenham, Andrew J; Kreft, Heather A; Carlyon, Robert P

    2013-01-01

    Many natural sounds fluctuate over time. The detectability of sounds in a sequence can be reduced by prior stimulation in a process known as forward masking. Forward masking is thought to reflect neural adaptation or neural persistence in the auditory nervous system, but it has been unclear where in the auditory pathway this processing occurs. To address this issue, the present study used a "Huggins pitch" stimulus, the perceptual effects of which depend on central auditory processing. Huggins pitch is an illusory tonal sensation produced when the same noise is presented to the two ears except for a narrow frequency band that is different (decorrelated) between the ears. The pitch sensation depends on the combination of the inputs to the two ears, a process that first occurs at the level of the superior olivary complex in the brainstem. Here it is shown that a Huggins pitch stimulus produces more forward masking in the frequency region of the decorrelation than a noise stimulus identical to the Huggins-pitch stimulus except with perfect correlation between the ears. This stimulus has a peripheral neural representation that is identical to that of the Huggins-pitch stimulus. The results show that processing in, or central to, the superior olivary complex can contribute to forward masking in human listeners.

  7. Central auditory masking by an illusory tone.

    Directory of Open Access Journals (Sweden)

    Christopher J Plack

    Full Text Available Many natural sounds fluctuate over time. The detectability of sounds in a sequence can be reduced by prior stimulation in a process known as forward masking. Forward masking is thought to reflect neural adaptation or neural persistence in the auditory nervous system, but it has been unclear where in the auditory pathway this processing occurs. To address this issue, the present study used a "Huggins pitch" stimulus, the perceptual effects of which depend on central auditory processing. Huggins pitch is an illusory tonal sensation produced when the same noise is presented to the two ears except for a narrow frequency band that is different (decorrelated between the ears. The pitch sensation depends on the combination of the inputs to the two ears, a process that first occurs at the level of the superior olivary complex in the brainstem. Here it is shown that a Huggins pitch stimulus produces more forward masking in the frequency region of the decorrelation than a noise stimulus identical to the Huggins-pitch stimulus except with perfect correlation between the ears. This stimulus has a peripheral neural representation that is identical to that of the Huggins-pitch stimulus. The results show that processing in, or central to, the superior olivary complex can contribute to forward masking in human listeners.

  8. Adaptation to different noninvasive ventilation masks in critically ill patients

    Directory of Open Access Journals (Sweden)

    Renata Matos da Silva

    2013-06-01

    Full Text Available OBJECTIVE: To identify which noninvasive ventilation (NIV masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. METHODS: An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. RESULTS: We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%. Total face masks were the most commonly used (in 74.7%, followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively. Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. CONCLUSIONS: In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed.

  9. Lithographic performance evaluation of a contaminated EUV mask after cleaning

    Energy Technology Data Exchange (ETDEWEB)

    George, Simi; Naulleau, Patrick; Okoroanyanwu, Uzodinma; Dittmar, Kornelia; Holfeld, Christian; Wuest, Andrea

    2009-11-16

    The effect of surface contamination and subsequent mask surface cleaning on the lithographic performance of a EUV mask is investigated. SEMATECH's Berkeley micro-field exposure tool (MET) printed 40 nm and 50 nm line and space (L/S) patterns are evaluated to compare the performance of a contaminated and cleaned mask to an uncontaminated mask. Since the two EUV masks have distinct absorber architectures, optical imaging models and aerial image calculations were completed to determine any expected differences in performance. Measured and calculated Bossung curves, process windows, and exposure latitudes for the two sets of L/S patterns are compared to determine how the contamination and cleaning impacts the lithographic performance of EUV masks. The observed differences in mask performance are shown to be insignificant, indicating that the cleaning process did not appreciably affect mask performance.

  10. Silicon germanium as a novel mask for silicon deep reactive ion etching

    KAUST Repository

    Serry, Mohamed Y.

    2013-10-01

    This paper reports on the use of p-type polycrystalline silicon germanium (poly-Si1-xGex) thin films as a new masking material for the cryogenic deep reactive ion etching (DRIE) of silicon. We investigated the etching behavior of various poly-Si1-xGex:B (0mask for silicon depends strongly on three factors: Ge content; boron concentration; and etching temperature. Compared to conventional SiO2 and SiN masks, the proposed SiGe masking material exhibited several advantages, including high etching selectivity to silicon (>1:800). Furthermore, the SiGe mask was etched in SF6/O2 plasma at temperatures ≥ - 80°C and at rates exceeding 8 μm/min (i.e., more than 37 times faster than SiO2 or SiN masks). Because of the chemical and thermodynamic stability of the SiGe film as well as the electronic properties of the mask, it was possible to deposit the proposed film at CMOS backend compatible temperatures. The paper also confirms that the mask can easily be dry-removed after the process with high etching-rate by controlling the ICP and RF power and the SF6 to O2 ratios, and without affecting the underlying silicon substrate. Using low ICP and RF power, elevated temperatures (i.e., > - 80°C), and an adjusted O2:SF6 ratio (i.e., ~6%), we were able to etch away the SiGe mask without adversely affecting the final profile. Ultimately, we were able to develop deep silicon- trenches with high aspect ratio etching straight profiles. © 1992-2012 IEEE.

  11. Task-Dependent Masked Priming Effects in Visual Word Recognition

    OpenAIRE

    Sachiko eKinoshita; Dennis eNorris

    2012-01-01

    A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal...

  12. Bulletin of Materials Science | Indian Academy of Sciences

    Indian Academy of Sciences (India)

    Home; Journals; Bulletin of Materials Science. G U Kulkarni. Articles written in Bulletin of Materials Science. Volume 24 Issue 5 October 2001 pp 515-521 Magnetic Materials. Submicron particles of Co, Ni and Co–Ni alloys · P Saravanan T A Jose P John Thomas G U Kulkarni · More Details Abstract Fulltext PDF. Magnetic ...

  13. Scatterometry on pelliclized masks: an option for wafer fabs

    Science.gov (United States)

    Gallagher, Emily; Benson, Craig; Higuchi, Masaru; Okumoto, Yasuhiro; Kwon, Michael; Yedur, Sanjay; Li, Shifang; Lee, Sangbong; Tabet, Milad

    2007-03-01

    Optical scatterometry-based metrology is now widely used in wafer fabs for lithography, etch, and CMP applications. This acceptance of a new metrology method occurred despite the abundance of wellestablished CD-SEM and AFM methods. It was driven by the desire to make measurements faster and with a lower cost of ownership. Over the last year, scatterometry has also been introduced in advanced mask shops for mask measurements. Binary and phase shift masks have been successfully measured at all desired points during photomask production before the pellicle is mounted. There is a significant benefit to measuring masks with the pellicle in place. From the wafer fab's perspective, through-pellicle metrology would verify mask effects on the same features that are characterized on wafer. On-site mask verification would enable quality control and trouble-shooting without returning the mask to a mask house. Another potential application is monitoring changes to mask films once the mask has been delivered to the fab (haze, oxide growth, etc.). Similar opportunities apply to the mask metrologist receiving line returns from a wafer fab. The ability to make line-return measurements without risking defect introduction is clearly attractive. This paper will evaluate the feasibility of collecting scatterometry data on pelliclized masks. We explore the effects of several different pellicle types on scatterometry measurements made with broadband light in the range of 320-780 nm. The complexity introduced by the pellicles' optical behavior will be studied.

  14. Does "Darkness" Lead to "Happiness"? Masked Suffix Priming Effects

    Science.gov (United States)

    Dunabeitia, Jon Andoni; Perea, Manuel; Carreiras, Manuel

    2008-01-01

    Masked affix priming effects have usually been obtained for words sharing the initial affix (e.g., "reaction"-"REFORM"). However, prior evidence on masked suffix priming effects (e.g., "baker"-"WALKER") is inconclusive. In the present series of masked priming lexical decision experiments, a target word was…

  15. How color, regularity, and good Gestalt determine backward masking.

    Science.gov (United States)

    Sayim, Bilge; Manassi, Mauro; Herzog, Michael

    2014-06-18

    The strength of visual backward masking depends on the stimulus onset asynchrony (SOA) between target and mask. Recently, it was shown that the conjoint spatial layout of target and mask is as crucial as SOA. Particularly, masking strength depends on whether target and mask group with each other. The same is true in crowding where the global spatial layout of the flankers and target-flanker grouping determine crowding strength. Here, we presented a vernier target followed by different flanker configurations at varying SOAs. Similar to crowding, masking of a red vernier target was strongly reduced for arrays of 10 green compared with 10 red flanking lines. Unlike crowding, single green lines flanking the red vernier showed strong masking. Irregularly arranged flanking lines yielded stronger masking than did regularly arranged lines, again similar to crowding. While cuboid flankers reduced crowding compared with single lines, this was not the case in masking. We propose that, first, masking is reduced when the flankers are part of a larger spatial structure. Second, spatial factors counteract color differences between the target and the flankers. Third, complex Gestalts, such as cuboids, seem to need longer processing times to show ungrouping effects as observed in crowding. Strong parallels between masking and crowding suggest similar underlying mechanism; however, temporal factors in masking additionally modulate performance, acting as an additional grouping cue. © 2014 ARVO.

  16. Performance and stability of mask process correction for EBM-7000

    Science.gov (United States)

    Saito, Yasuko; Chen, George; Wang, Jen-Shiang; Bai, Shufeng; Howell, Rafael; Li, Jiangwei; Tao, Jun; VanDenBroeke, Doug; Wiley, Jim; Takigawa, Tadahiro; Ohnishi, Takayuki; Kamikubo, Takashi; Hara, Shigehiro; Anze, Hirohito; Hattori, Yoshiaki; Tamamushi, Shuichi

    2010-05-01

    In order to support complex optical masks today and EUV masks in the near future, it is critical to correct mask patterning errors with a magnitude of up to 20nm over a range of 2000nm at mask scale caused by short range mask process proximity effects. A new mask process correction technology, MPC+, has been developed to achieve the target requirements for the next generation node. In this paper, the accuracy and throughput performance of MPC+ technology is evaluated using the most advanced mask writing tool, the EBM-70001), and high quality mask metrology . The accuracy of MPC+ is achieved by using a new comprehensive mask model. The results of through-pitch and through-linewidth linearity curves and error statistics for multiple pattern layouts (including both 1D and 2D patterns) are demonstrated and show post-correction accuracy of 2.34nm 3σ for through-pitch/through-linewidth linearity. Implementing faster mask model simulation and more efficient correction recipes; full mask area (100cm2) processing run time is less than 7 hours for 32nm half-pitch technology node. From these results, it can be concluded that MPC+ with its higher precision and speed is a practical technology for the 32nm node and future technology generations, including EUV, when used with advance mask writing processes like the EBM-7000.

  17. Characterizing the monaural and binaural processes underlying reflection masking

    DEFF Research Database (Denmark)

    Buchholz, Jörg

    2007-01-01

    Reflection masked thresholds (RMTs) for the simple scenario of a test reflection masked by the direct sound (200 ms long broadband noise) were measured as a function of reflection delay for diotic and dichotic stimulus presentations. In order to discriminate between contributions to reflection....... The monaural and binaural processes that may underlie reflection masking are discussed in terms of auditory-modelling concepts....

  18. Assessing breast cancer masking risk with automated texture analysis in full field digital mammography

    DEFF Research Database (Denmark)

    Kallenberg, Michiel Gijsbertus J; Lillholm, Martin; Diao, Pengfei

    2015-01-01

    negative and subsequently appeared as interval cancers. To obtain mammograms without cancerous tissue, we took the contralateral mammograms. We developed a novel machine learning based method called convolutional sparse autoencoder to characterize mammographic texture. The reason for focusing......PURPOSE The goal of this work is to develop a method to assess the risk of breast cancer masking, based on image characteristics beyond breast density. METHOD AND MATERIALS From the Dutch breast cancer screening program we collected 285 screen detected cancers, and 109 cancers that were screen...... on mammographic texture rather than the amount of breast density is that a developing cancer may not only be masked because it is obscured; it may also be masked because its mammographic signs resemble the texture of normal tissue. The method was trained and tested on raw mammograms to determine cancer detection...

  19. Study on storage components and application performance for mask haze prevention

    Science.gov (United States)

    Chen, Shu Li; Fang, T. Y.; Lai, Ryan; Lee, Chun Der; Yeh, Shang Hao; Chen, Timmy

    2012-06-01

    The amount of sulfate ion on mask surface will increase haze defect growing once exposed by an ArF laser. And then the storage conditions influence amount of sulfate ion was investigated. Therefore, our evaluations used extraction method and IC (Ion Chromatography) test to examine the amount of ions for current mask pods and storage cabinet. The pods included the different material of ABS (Amber and Violet Acrylonitrile Butadiene Styrene), PMMA (Polymethyl meth acrylate), PEEK (Polyether ether ketone), Metal case, LCP (Liquid Crystal Plastic), PC+CF (Polycarbonate with carbon fiber) and PC+CNT (Polycarbonate with Carbon nano-tubes). Moreover, PSM (Phase shift Mask) haze life time and dosage was strongly interrelated with the amount of chemical contaminant aggregation for storage pods. The other factor to impact haze generation of ArF PSM masks is the condition of storage environment; therefore, we're comparing the different structure of cabinet from different vendors to extend mask life time. They included 3 types of storage system: cabinet with XCDA, purge cabinet and purge stocker. According to this point of view, we used the impinger and Cr Blank IC test to verify the best storage system and remove some of the polluted parts for cabinet to ensure haze free. Resulting from our investigations, we setup storage BKM (Best Known Method) and monitor haze performance to record their results. Consequently, the optimization components of storages will contribute the enormously economical benefit.

  20. A nanohybrid system for taste masking of sildenafil.

    Science.gov (United States)

    Lee, Ji-Hee; Choi, Goeun; Oh, Yeon-Ji; Park, Je Won; Choy, Young Bin; Park, Mung Chul; Yoon, Yeo Joon; Lee, Hwa Jeong; Chang, Hee Chul; Choy, Jin-Ho

    2012-01-01

    A nanohybrid was prepared with an inorganic clay material, montmorillonite (MMT), for taste masking of sildenafil (SDN). To further improve the taste-masking efficiency and enhance the drug-release rate, we coated the nanohybrid of SDN-MMT with a basic polymer, polyvinylacetal diethylaminoacetate (AEA). Powder X-ray diffraction and Fourier transform infrared experiments showed that SDN was successfully intercalated into the interlayer space of MMT. The AEA-coated SDN-MMT nanohybrid showed drug release was much suppressed at neutral pH (release rate, 4.70 ± 0.53%), suggesting a potential for drug taste masking at the buccal cavity. We also performed in vitro drug release experiments in a simulated gastric fluid (pH = 1.2) and compared the drug-release profiles of AEA-coated SDN-MMT and Viagra(®), an approved dosage form of SDN. As a result, about 90% of SDN was released from the AEA-coated SDN-MMT during the first 2 hours while almost 100% of drug was released from Viagra(®). However, an in vivo experiment showed that the AEA-coated SDN-MMT exhibited higher drug exposure than Viagra(®). For the AEA-coated SDN-MMT, the area under the plasma concentration- time curve from 0 hours to infinity (AUC(0-∞)) and maximum concentration (C(max)) were 78.8 ± 2.32 μg · hour/mL and 12.4 ± 0.673 μg/mL, respectively, both of which were larger than those obtained with Viagra(®) (AUC(0-∞) = 69.2 ± 3.19 μg · hour/mL; C(max) = 10.5 ± 0.641 μg/mL). Therefore, we concluded that the MMT-based nanohybrid is a promising delivery system for taste masking of SDN with possibly improved drug exposure.

  1. Application of advanced structure to multi-tone mask for FPD process

    Science.gov (United States)

    Song, Jin-Han; Jeong, Jin-Woong; Kim, Kyu-Sik; Jeong, Woo-Gun; Yun, Sang-Pil; Lee, Dong-Heok; Choi, Sang-Soo

    2017-07-01

    In accordance with improvement of FPD technology, masks such as phase shift mask (PSM) and multi-tone mask (MTM) for a particular purpose also have been developed. Above all, the MTM consisted of more than tri-tone transmittance has a substantial advantage which enables to reduce the number of mask demand in FPD fabrication process contrast to normal mask of two-tone transmittance.[1,2] A chromium (Cr)-based MTM (Typically top type) is being widely employed because of convenience of etch process caused by its only Cr-based structure consisted of Cr absorber layer and Cr half-tone layer. However, the top type of Cr-based MTM demands two Cr sputtering processes after each layer etching process and writing process. For this reason, a different material from the Cr-based MTM is required for reduction of mask fabrication time and cost. In this study, we evaluate a MTM which has a structure combined Cr with molybdenum silicide (MoSi) to resolve the issues mentioned above. The MoSi which is demonstrated by integrated circuit (IC) process is a suitable material for MTM evaluation. This structure could realize multi-transmittance in common with the Cr-based MTM. Moreover, it enables to reduce the number of sputtering process. We investigate a optimized structure upon consideration of productivity along with performance such as critical dimension (CD) variation and transmittance range of each structure. The transmittance is targeted at h-line wavelength (405 nm) in the evaluation. Compared with Cr-based MTM, the performances of all Cr-/MoSi-based MTMs are considered.

  2. High precision x ray lithographic masks

    Science.gov (United States)

    Pease, R. F.; Browning, R.

    1992-09-01

    This contract period was first concerned with winding up the projects on the embedded X-ray Mask structure and on the 'quantum lithography' idea. As a result of developments elsewhere it became clear that among the most critical issues in achieving high precision X-ray masks were those associated with achieving high precision in both feature size and feature placement in electron beam lithography. Most of the effort in this reporting period was aimed at achieving precision in feature size; notably an attack on the problem of proximity effects. There were two approaches: (1) A short term approach aimed at correcting effects in existing electron beam pattern generators (notably the ETEC MEBES 3 and 4) for feature sizes down 500 nm; and (2) A long term approach aimed at avoiding proximity effects by employing low energy electron exposure for feature size below 500 nm.

  3. Reducing backward masking through action game training.

    Science.gov (United States)

    Li, Renjie; Polat, Uri; Scalzo, Fabien; Bavelier, Daphne

    2010-12-29

    Action video game play enhances basic visual skills such as crowding acuity and contrast sensitivity (C. S. Green & D. Bavelier, 2007; R. Li, U. Polat, W. Makous, & D. Bavelier, 2009). Here, we ask whether the dynamics of perception may also be altered as a result of playing action games. A backward masking paradigm was used to test the hypothesis that action video game play also alters the temporal dynamics of vision. As predicted, action gamers showed reduced backward masking and an accompanying training study established the causal role of action game play in this enhancement. Implications of this result are discussed in the context of the faster reaction times and enhanced sensitivity also documented after action game play.

  4. Reduced basis method for source mask optimization

    CERN Document Server

    Pomplun, J; Burger, S; Schmidt, F; Tyminski, J; Flagello, D; Toshiharu, N; 10.1117/12.866101

    2010-01-01

    Image modeling and simulation are critical to extending the limits of leading edge lithography technologies used for IC making. Simultaneous source mask optimization (SMO) has become an important objective in the field of computational lithography. SMO is considered essential to extending immersion lithography beyond the 45nm node. However, SMO is computationally extremely challenging and time-consuming. The key challenges are due to run time vs. accuracy tradeoffs of the imaging models used for the computational lithography. We present a new technique to be incorporated in the SMO flow. This new approach is based on the reduced basis method (RBM) applied to the simulation of light transmission through the lithography masks. It provides a rigorous approximation to the exact lithographical problem, based on fully vectorial Maxwell's equations. Using the reduced basis method, the optimization process is divided into an offline and an online steps. In the offline step, a RBM model with variable geometrical param...

  5. Dose masking feature for BNCT radiotherapy planning

    Science.gov (United States)

    Cook, Jeremy L.; Wessol, Daniel E.; Wheeler, Floyd J.

    2000-01-01

    A system for displaying an accurate model of isodoses to be used in radiotherapy so that appropriate planning can be performed prior to actual treatment on a patient. The nature of the simulation of the radiotherapy planning for BNCT and Fast Neutron Therapy, etc., requires that the doses be computed in the entire volume. The "entire volume" includes the patient and beam geometries as well as the air spaces in between. Isodoses derived from the computed doses will therefore extend into the air regions between the patient and beam geometries and thus depict the unrealistic possibility that radiation deposition occurs in regions containing no physical media. This problem is solved by computing the doses for the entire geometry and then masking the physical and air regions along with the isodose contours superimposed over the patient image at the corresponding plane. The user is thus able to mask out (remove) the contour lines from the unwanted areas of the image by selecting the appropriate contour masking region from the raster image.

  6. Submicron particles of Co, Ni and Co–Ni alloys

    Indian Academy of Sciences (India)

    Unknown

    Solid State Ionics 84 271. Ayyappan S, Gopalan R S, Subbanna G N and Rao C N R 1997. J. Mater. Res. 12 398. Bradley J S 1994 Clusters and colloids: From theory to appli- cations (eds) G Schmid (Weinheim: VCH) Ch. 1. Cullity B D 1972 Introduction to magnetic materials (Reading,. Massachusetts: Addison-Wesley).

  7. Aerial image metrology for OPC modeling and mask qualification

    Science.gov (United States)

    Chen, Ao; Foong, Yee Mei; Thaler, Thomas; Buttgereit, Ute; Chung, Angeline; Burbine, Andrew; Sturtevant, John; Clifford, Chris; Adam, Kostas; De Bisschop, Peter

    2017-06-01

    As nodes become smaller and smaller, the OPC applied to enable these nodes becomes more and more sophisticated. This trend peaks today in curve-linear OPC approaches that are currently starting to appear on the roadmap. With this sophistication of OPC, the mask pattern complexity increases. CD-SEM based mask qualification strategies as they are used today are starting to struggle to provide a precise forecast of the printing behavior of a mask on wafer. An aerial image CD measurement performed on ZEISS Wafer-Level CD system (WLCD) is a complementary approach to mask CD-SEMs to judge the lithographical performance of the mask and its critical production features. The advantage of the aerial image is that it includes all optical effects of the mask such as OPC, SRAF, 3D mask effects, once the image is taken under scanner equivalent illumination conditions. Additionally, it reduces the feature complexity and analyzes the printing relevant CD.

  8. Mask design rules (45 nm): time for standardization

    Science.gov (United States)

    Mason, Mark; Progler, Christopher J.; Martin, Patrick; Ham, Young-Mog; Dillon, Brian; Pack, Robert; Heins, Mitch; Gookassian, John; Garcia, John; Boksha, Victor

    2005-11-01

    Time-to-mask (ttm) has been growing exponentially in the subwavelength era with the increased application of advanced RET's (Resolution Enhancement Technology). Not only are a greater number of design/mask layers impacted but more-and-more layers also have more severe restrictions on critical dimension uniformity (CDU) despite operating at a very low k1 factors necessitating rigorous but practical tolerancing. Furthermore, designs are also more complex, may be built up from blocks spanning different design styles, and occupy increasingly-large Rayleigh field areas. Given these factors and scales, it's no wonder that the cycle time for verification of a design following RET, is growing however it is doing so exponentially and that this is a critical factor impeding ttm. Until an unambiguously interprable and standard Mask Design Rule (MaskDR) set is created, neither the designer nor the mask supplier can reliably verify manufacturability of the mask for the simple reason that ambiguity and inter-rule conflict are at the source of the problem and that the problem increasingly requires cooperation spanning a large ecosystem of tool, IP, and mask suppliers all needing to essentially speak the same language. Since the 130 nm node, Texas Instruments has enforced a strict set of mask rule checks (MRCs) in their mask data preparation (MDP) flow based on MaskDRs negotiated with their mask suppliers. The purpose of this effort has been to provide an a-priori guarantee that the data shipped to the mask shop can be used to manufacture a mask reliably and with high yield both from a mask standpoint and from the silicon standpoint. As has been reported earlier, mask manufacturing rules are usually determined from assumed or experimentally acquired/validated mask-manufacturing limits. These rules are then applied during RET/MDP data treatment to guide and/or limit pattern correction strategies. With increasing RET and low-k1 lithography challenges, the importance of MRCs

  9. Enhancements of the refractory submicron aerosol fraction in the Arctic polar vortex: feature or exception?

    Science.gov (United States)

    Weigel, R.; Volk, C. M.; Kandler, K.; Hösen, E.; Günther, G.; Vogel, B.; Grooß, J.-U.; Khaykin, S.; Belyaev, G. V.; Borrmann, S.

    2014-11-01

    In situ measurements with a four-channel stratospheric condensation particle counter (CPC) were conducted at up to 20 km altitude on board the aircraft M-55 Geophysica from Kiruna, Sweden, in January through March (EUPLEX 2003, RECONCILE 2010) and in December (ESSenCe 2011). During all campaigns air masses from the upper stratosphere and mesosphere were subsiding inside the Arctic winter vortex, thus initializing a transport of refractory aerosol into the lower stratosphere (Θ content of nitrous oxide (70 nmol mol-1 of N2O). This indicates that refractory aerosol originates from the upper stratosphere or the mesosphere. Derived from the mixing ratio of the simultaneously measured long-lived tracer N2O, an empirical index serves to differentiate probed air masses according to their origin: inside the vortex, the vortex edge region, or outside the vortex. Previously observed high fractions of refractory submicron aerosol in the 2003 Arctic vortex were ascribed to unusually strong subsidence during that winter. However, measurements under perturbed vortex conditions in 2010 and during early winter in December 2011 revealed similarly high values. Thus, the abundance of refractory aerosol in the lower stratosphere within the Arctic vortices appears to be a regular feature rather than the exception. During December, the import from aloft into the lower stratosphere appears to be developing; thereafter the abundance of refractory aerosol inside the vortex reaches its highest levels in March. The correlations of refractory aerosol with N2O suggest that, apart from mean subsidence, diabatic dispersion inside the vortex significantly contributes to the transport of particles to the Arctic lower stratosphere. A measurement-based estimate of the total mass of refractory aerosol inside the vortex is provided for each campaign. Based on the derived increase of particle mass in the lower stratospheric vortex (100-67 hPa pressure altitude) by a factor of 4.5 between early and

  10. Influence of locational states of submicron fibers added into matrix on mechanical properties of plain-woven Carbon Fiber Composite

    National Research Council Canada - National Science Library

    Soichiro Kumamoto; Kazuya Okubo; Toru Fujii

    2016-01-01

    The aim of this study was to show the influence of locational states of submicron fibers added into epoxy matrix on mechanical properties of modified plane-woven carbon fiber reinforced plastic (CFRP...

  11. Comparison of different techniques of laryngeal mask placement in children.

    Science.gov (United States)

    Ghai, Babita; Wig, Jyotsna

    2009-06-01

    The insertion of laryngeal mask airway is not always easy in children, and many techniques are described to improve success rate of placement. It is very important to determine the optimal insertion technique as unsuccessful prolonged insertion and multiple attempts are associated with adverse respiratory events and trauma in children. This article will review different techniques studied recently for the placement of classical laryngeal mask airway in children as well as recent findings of cuff pressure and depth of anesthesia for laryngeal mask airway placement. Laryngeal mask airway in children has undergone many modifications such as ProSeal laryngeal mask airway to improve its functioning. This article will also review different insertion techniques for ProSeal laryngeal mask airway. Rotational technique with partially inflated cuff is reported to have the highest success rate of insertion and lowest incidence of complications for classical laryngeal mask airway in children. Clinical endpoints for cuff inflation are associated with significant hyperinflation and increased leakage around the laryngeal mask airway cuff. The inferences regarding the dosage of intravenous anesthetic agents and end-tidal concentration of volatile anesthetics in children to achieve adequate depth for laryngeal mask airway placement are very difficult to draw. ProSeal laryngeal mask airway is associated with a very high first attempt success and overall success of insertion in children. Rotational technique may be considered as the first technique of choice for classical laryngeal mask airway insertion in children. The routine use of cuff pressure monitoring is mandatory during the use of laryngeal mask airway in children. Modification of laryngeal mask airway in children, that is ProSeal laryngeal mask airway, is promising and improves the success rate of insertion.

  12. Objective measures of binaural masking level differences and comodulation masking release based on late auditory evoked potentials

    DEFF Research Database (Denmark)

    Epp, Bastian; Yasin, Ifat; Verhey, Jesko L.

    2013-01-01

    The audibility of important sounds is often hampered due to the presence of other masking sounds. The present study investigates if a correlate of the audibility of a tone masked by noise is found in late auditory evoked potentials measured from human listeners. The audibility of the target sound...... in a masking release (i: binaural masking level difference; ii: comodulation masking release) compared to a condition where those cues are not present. Late auditory evoked potentials (N1, P2) were recorded for the stimuli at a constant masker level, but different signal levels within the same set of listeners...

  13. Moment expansion approach to calculate impact ionization rate in submicron silicon devices

    Science.gov (United States)

    Sonoda, Ken-ichiro; Yamaji, Mitsuru; Taniguchi, Kenji; Hamaguchi, Chihiro; Dunham, Scott T.

    1996-11-01

    A method to calculate the impact ionization rate in submicron silicon devices is developed using both an average energy and an average square energy of electrons. The method consists of an impact ionization model formulated with the average energy and conservation equations for the average square energy in the framework of an energy transport model. Parameters for the transport equations are extracted in such a way that calculated moments based on these equations match Monte Carlo simulation results. The impact ionization generation rate in an n+nn+ structure calculated with this method agrees well with the results obtained from Monte Carlo simulation. The new method is also applied to a submicron n-MOSFET. The calculated distribution of the generation rate is found to be quite different from the results based on a conventional method.

  14. A novel multi-level IC-compatible surface microfabrication technology for MEMS with independently controlled lateral and vertical submicron transduction gaps

    Science.gov (United States)

    Cicek, Paul-Vahe; Elsayed, Mohannad; Nabki, Frederic; El-Gamal, Mourad

    2017-11-01

    An above-IC compatible multi-level MEMS surface microfabrication technology based on a silicon carbide structural layer is presented. The fabrication process flow provides optimal electrostatic transduction by allowing the creation of independently controlled submicron vertical and lateral gaps without the need for high resolution lithography. Adopting silicon carbide as the structural material, the technology ensures material, chemical and thermal compatibility with modern semiconductor nodes, reporting the lowest peak processing temperature (i.e. 200 °C) of all comparable works. This makes this process ideally suited for integrating capacitive-based MEMS directly above standard CMOS substrates. Process flow design and optimization are presented in the context of bulk-mode disk resonators, devices that are shown to exhibit improved performance with respect to previous generation flexural beam resonators, and that represent relatively complex MEMS structures. The impact of impending improvements to the fabrication technology is discussed.

  15. Submicron ionography of nanostructures using a femtosecond-laser-driven-cluster-based source

    OpenAIRE

    Faenov, A. Ya; Pikuz, T. A.; Fukuda, Y.(Miyagi University of Education, Department of Physics, Sendai, Japan); Kando, M; Kotaki, H.; Homma, T.; KAWASE, K; Kameshima, T.; Pirozkhov, A.; Yogo, A.; Tampo, M.; Mori, M.; Sakaki, H.; Hayashi, Y; Nakamura, T.

    2009-01-01

    An intense isotropic source of multicharged carbon and oxygen ions with energy above 300 keV and particle number >108 per shot was obtained by femtosecond Ti:Sa laser irradiation of submicron clusters. The source was employed for high-contrast contact ionography images with 600 nm spatial resolution. A variation in object thickness of 100 nm was well resolved for both Zr and polymer foils.

  16. Comprehensive investigation of the dynamics of micron and submicron lunar ejecta in heliocentric space

    Energy Technology Data Exchange (ETDEWEB)

    Hargrave, A.D.

    1984-01-01

    The forces which act on micron and submicron dust particles in interplanetary space are studied in detail. Particular attention is given to Mie scattering theory as it applies to the calculation of the force due to radiation pressure. All of the forces are integrated into a computer model to study the heliocentric orbits of lunar ejecta. It is shown that lunar ejecta contribute to a geocentric dust cloud, as well as to a heliocentric dust belt.

  17. Assessment of Sub-Micron Particles by Exploiting Charge Differences with Dielectrophoresis

    Directory of Open Access Journals (Sweden)

    Maria F. Romero-Creel

    2017-08-01

    Full Text Available The analysis, separation, and enrichment of submicron particles are critical steps in many applications, ranging from bio-sensing to disease diagnostics. Microfluidic electrokinetic techniques, such as dielectrophoresis (DEP have proved to be excellent platforms for assessment of submicron particles. DEP is the motion of polarizable particles under the presence of a non-uniform electric field. In this work, the polarization and dielectrophoretic behavior of polystyrene particles with diameters ranging for 100 nm to 1 μm were studied employing microchannels for insulator based DEP (iDEP and low frequency (<1000 Hz AC and DC electric potentials. In particular, the effects of particle surface charge, in terms of magnitude and type of functionalization, were examined. It was found that the magnitude of particle surface charge has a significant impact on the polarization and dielectrophoretic response of the particles, allowing for successful particle assessment. Traditionally, charge differences are exploited employing electrophoretic techniques and particle separation is achieved by differential migration. The present study demonstrates that differences in the particle’s surface charge can also be exploited by means of iDEP; and that distinct types of nanoparticles can be identified by their polarization and dielectrophoretic behavior. These findings open the possibility for iDEP to be employed as a technique for the analysis of submicron biological particles, where subtle differences in surface charge could allow for rapid particle identification and separation.

  18. Continuous Draw Spinning of Extra-Long Silver Submicron Fibers with Micrometer Patterning Capability.

    Science.gov (United States)

    Bai, Xiaopeng; Liao, Suiyang; Huang, Ya; Song, Jianan; Liu, Zhenglian; Fang, Minghao; Xu, Chencheng; Cui, Yi; Wu, Hui

    2017-03-08

    Ultrathin metal fibers can serve as highly conducting and flexible current and heat transport channels, which are essential for numerous applications ranging from flexible electronics to energy conversion. Although industrial production of metal fibers with diameters of down to 2 μm is feasible, continuous production of high-quality and low-cost nanoscale metal wires is still challenging. Herein, we report the continuous draw spinning of highly conductive silver submicron fibers with the minimum diameter of ∼200 nm and length of more than kilometers. We obtained individual AgNO3/polymer fibers by continuous drawing from an aqueous solution at a speed of up to 8 m/s. With subsequent heat treatment, freestanding Ag submicron fibers with high mechanical flexibility and electric conductivity have been obtained. Woven mats of aligned Ag submicron fibers were used as transparent electrodes with high flexibility and high performance with sheet resistance of 7 Ω sq(-1) at a transparency of 96%. Continuous draw spinning opened new avenues for scalable, flexible, and ultralow-cost fabrication of extra-long conductive ultrathin metal fibers.

  19. Directed assembly of conducting polymers on sub-micron templates by electrical fields

    Energy Technology Data Exchange (ETDEWEB)

    Shen, Jia; Wei, Ming [National Science Foundation (NSF) Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing, University of Massachusetts Lowell, Lowell, MA 01854 (United States); Busnaina, Ahmed [National Science Foundation (NSF) Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing, Northeastern University, Boston, MA 02115 (United States); Barry, Carol [National Science Foundation (NSF) Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing, University of Massachusetts Lowell, Lowell, MA 01854 (United States); Mead, Joey, E-mail: Joey_Mead@uml.edu [National Science Foundation (NSF) Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing, University of Massachusetts Lowell, Lowell, MA 01854 (United States)

    2013-02-20

    Highlights: Black-Right-Pointing-Pointer Nanoscale patterns with dimensions of assembled PANi down to 100 nm were fabricated. Black-Right-Pointing-Pointer We use electrophoretic and dielectrophoretic assembly to deposit PANi. Black-Right-Pointing-Pointer Electrophoretic and dielectrophoretic assembly of PANi finished in less than 1 min. Black-Right-Pointing-Pointer Effect of process parameters on assembly of PANi onto nanoscale pattern was studied. Black-Right-Pointing-Pointer The assembled PANi can be transferred to other flexible substrates. - Abstract: Patterning of conducting polymer into sub-micron patterns over large areas at high rate and low cost is significant for commercial manufacturing of novel devices. Electrophoretic and dielectrophoretic assembly provide an easily scaled approach with high fabrication rates. In this work, electrophoretic and dielectrophoretic assembly were used to assemble polyaniline (PANi) into multiscale sub-micron size patterns in less than 1 min. The process was controlled by assembly time, amplitude, and frequency of the electric field. Dielectrophoretic assembly is preferable for manufacturing as it reduces damage to the templates used to control the assembly. Using this method, sub-micron patterns with dimensions of the assembled PANi down to 100 nm were fabricated over large areas in short times. The assembled PANi was further transferred to other flexible polymer substrates by a thermoforming process, providing a fast, easily controlled and promising approach for fabrication of nanoscale devices.

  20. Influence of PEG Stoichiometry on Structure-Tuned Formation of Self-Assembled Submicron Nickel Particles

    Directory of Open Access Journals (Sweden)

    Bingxue Pu

    2018-01-01

    Full Text Available Self-assembled submicron nickel particles were successfully synthesized via the one-step surfactant-assisted solvothermal method. The impact of surfactant and reducing agent stoichiometry is investigated in this manuscript. Different morphologies and structures of Ni particles, including flower-like nanoflakes, hydrangea-like structures, chain structures, sphere-like structures, and hollow structures were prepared through different processing conditions with two parameters such as temperature and time. Based on scanning electron microscopy (SEM, X-ray diffraction (XRD, thermal gravimetric analysis (TGA and vibrating sample magnetometry (VSM, the submicron nickel particles show good saturation magnetization and excellent thermal stabilities with a possible growth mechanism for the variety of the structure-tuned formation. Importantly, the microwave absorption properties of the submicron nickel particles were studied. The lowest reflection loss of Ni-P9/T200/H15 with a thin layer thickness of 1.7 mm can reach −42.6 dB at 17.3 GHz.

  1. The study to reduce the hemolysis side effect of puerarin by a submicron emulsion delivery system.

    Science.gov (United States)

    Yue, Peng-Fei; Hai-Long Yuan, Hai-Long; Zhu, Wei-Feng; Cong, Long-Bo; Xie, Huan; Liu, Zhi-Guo; Wang, Lu-Jun; Xiao, Xiao-He

    2008-01-01

    A safe and effective delivery system with a submicron emulsion for puerarin was studied. Puerarin submicron emulsion was prepared by a novel complex-phase inversion-high press homogenization technology. The mechanism to reduce the hemolysis side effect of puerarin was studied by blood cell counts in rabbits. The average diameter, zeta potential and entrapment efficiency of the emulsion prepared was 198.14+/-8.61 nm, -29.45+/-1.47 mV, 87.32+/-0.34%, respectively. Compared with control group, the red blood cell values, packed cell volume, plasma hemoglobin level, haptoglobin level and osmotic fragility of puerarin i.v. group was significantly different (pemulsion group were not significantly different (p>0.05) in contrast to control group. Such observations indicated that the intravascular hemolysis occurred at 42, 43 d in puerarin i.v. group rabbits, the hemolysis did not occur for puerarin emulsion group rabbits. As an explanation for these results, it was proposed that the puerarin was either incorporated into the lipophilic core or intercalated between the phospholipid molecules at the interface. It could be concluded that puerarin submicron emulsions prepared markedly reduced the hemolysis effect of puerarin.

  2. A flow cytometry-based submicron-sized bacterial detection system using a movable virtual wall.

    Science.gov (United States)

    Choi, Hyoungseon; Jeon, Chang Su; Hwang, Inseong; Ko, Juhui; Lee, Saram; Choo, Jaebum; Boo, Jin-Hyo; Kim, Hee Chan; Chung, Taek Dong

    2014-07-07

    Detection of pathogenic bacteria requires a sensitive, accurate, rapid, and portable device. Given that lethal microbes are of various sizes, bacterial sensors based on DC (direct current) impedance on chips should be equipped with channels with commensurate cross sections. When it comes to counting and interrogation of individual bacteria on a microfluidic chip, very narrow channels are required, which are neither easy nor cost-effective to fabricate. Here, we report a flow cytometry-based submicron-sized bacterial detection system using a movable virtual wall made of a non-conducting fluid. We show that the effective dimension of a microfluidic channel can be adjusted by varying the respective flow rates of a sample solution as well as the liquid wall therein. Using such a virtual wall, we have successfully controlled the channel width and detected submicron-sized Francisella tularensis, a lethal, tularemia-causing bacterium. Since the system is capable of monitoring changes in DC impedance and fluorescence simultaneously, we were also able to discriminate between different types of bacterial mixtures containing F. tularensis and E. coli BL21 that have different gamuts of size distributions. The proposed flow cytometry-based system represents a promising way to detect bacteria including, but not limited to, submicron-sized pathogenic microbes.

  3. Aerodynamics and deposition effects of inhaled submicron drug aerosol in airway diseases.

    Science.gov (United States)

    Faiyazuddin, Md; Mujahid, Md; Hussain, Talib; Siddiqui, Hefazat H; Bhatnagar, Aseem; Khar, Roop K; Ahmad, Farhan J

    2013-01-01

    Particle engineering is the prime focus to improve pulmonary drug targeting with the splendor of nanomedicines. In recent years, submicron particles have emerged as prettyful candidate for improved fludisation and deposition. For effective deposition, the particle size must be in the range of 0.5-5 μm. Inhalers design for the purpose of efficient delivery of powders to lungs is again a crucial task for pulmonary scientists. A huge number of DPI devices exist in the market, a significant number are awaiting FDA approval, some are under development and a large number have been patented or applied for patent. Even with superior design, the delivery competence is still deprived, mostly due to fluidisation problems which cause poor aerosol generation and deposition. Because of the cohesive nature and poor flow characteristics, they are difficult to redisperse upon aerosolization with breath. These problems are illustrious in aerosol research, much of which is vastly pertinent to pulmonary therapeutics. A technical review is presented here of advances that have been utilized in production of submicron drug particles, their in vitro/in vivo evaluations, aerosol effects and pulmonary fate of inhaled submicron powders.

  4. Reducing DRIFT Backgrounds with a Submicron Aluminized-Mylar Cathode

    OpenAIRE

    Battat, J. S. R.; Daw, E.; Dorofeev, A.; Ezeribe, A. C.; Fox, J. R.; Gauvreau, J-L.; Gold, M; Harmon, L.; Harton, J.; Lafler, R.; Landers, J.; Lauer, R. J.; Lee, E.R.; Loomba, D.; Lumnah, A.

    2015-01-01

    Background events in the DRIFT-IId dark matter detector, mimicking potential WIMP signals, are predominantly caused by alpha decays on the central cathode in which the alpha particle is completely or partially absorbed by the cathode material. We installed a 0.9 micron thick aluminized-mylar cathode as a way to reduce the probability of producing these backgrounds. We study three generations of cathode (wire, thin-film, and radiologically clean thin-film) with a focus on the ratio of backgrou...

  5. Fast synthesis of topographic mask effects based on rigorous solutions

    Science.gov (United States)

    Yan, Qiliang; Deng, Zhijie; Shiely, James

    2007-10-01

    Topographic mask effects can no longer be ignored at technology nodes of 45 nm, 32 nm and beyond. As feature sizes become comparable to the mask topographic dimensions and the exposure wavelength, the popular thin mask model breaks down, because the mask transmission no longer follows the layout. A reliable mask transmission function has to be derived from Maxwell equations. Unfortunately, rigorous solutions of Maxwell equations are only manageable for limited field sizes, but impractical for full-chip optical proximity corrections (OPC) due to the prohibitive runtime. Approximation algorithms are in demand to achieve a balance between acceptable computation time and tolerable errors. In this paper, a fast algorithm is proposed and demonstrated to model topographic mask effects for OPC applications. The ProGen Topographic Mask (POTOMAC) model synthesizes the mask transmission functions out of small-sized Maxwell solutions from a finite-difference-in-time-domain (FDTD) engine, an industry leading rigorous simulator of topographic mask effect from SOLID-E. The integral framework presents a seamless solution to the end user. Preliminary results indicate the overhead introduced by POTOMAC is contained within the same order of magnitude in comparison to the thin mask approach.

  6. Strategy optimization for mask rule check in wafer fab

    Science.gov (United States)

    Yang, Chuen Huei; Lin, Shaina; Lin, Roger; Wang, Alice; Lee, Rachel; Deng, Erwin

    2015-07-01

    Photolithography process is getting more and more sophisticated for wafer production following Moore's law. Therefore, for wafer fab, consolidated and close cooperation with mask house is a key to achieve silicon wafer success. However, generally speaking, it is not easy to preserve such partnership because many engineering efforts and frequent communication are indispensable. The inattentive connection is obvious in mask rule check (MRC). Mask houses will do their own MRC at job deck stage, but the checking is only for identification of mask process limitation including writing, etching, inspection, metrology, etc. No further checking in terms of wafer process concerned mask data errors will be implemented after data files of whole mask are composed in mask house. There are still many potential data errors even post-OPC verification has been done for main circuits. What mentioned here are the kinds of errors which will only occur as main circuits combined with frame and dummy patterns to form whole reticle. Therefore, strategy optimization is on-going in UMC to evaluate MRC especially for wafer fab concerned errors. The prerequisite is that no impact on mask delivery cycle time even adding this extra checking. A full-mask checking based on job deck in gds or oasis format is necessary in order to secure acceptable run time. Form of the summarized error report generated by this checking is also crucial because user friendly interface will shorten engineers' judgment time to release mask for writing. This paper will survey the key factors of MRC in wafer fab.

  7. Masked suffix priming and morpheme positional constraints.

    Science.gov (United States)

    Crepaldi, Davide; Hemsworth, Lara; Davis, Colin J; Rastle, Kathleen

    2016-01-01

    Although masked stem priming (e.g., dealer-DEAL) is one of the most established effects in visual word identification, it is less clear whether primes and targets sharing a suffix (e.g., kindness-WILDNESS) also yield facilitation. In a new take on this issue, we show that prime nonwords facilitate lexical decisions to target words ending with the same suffix (sheeter-TEACHER) compared to a condition where the critical suffix was substituted by another one (sheetal-TEACHER) or by an unrelated nonmorphological ending (sheetub- TEACHER). We also show that this effect is genuinely morphological, as no priming emerged in noncomplex items with the same orthographic characteristics (sportel-BROTHEL vs. sportic-BROTHEL vs. sportur-BROTHEL). In a further experiment, we took advantage of these results to assess whether suffixes are recognized in a position-specific fashion. Masked suffix priming did not emerge when the relative order of stems and suffixes was reversed in the prime nonwords-ersheet did not yield any time saving in the identification of teacher as compared to either alsheet or obsheet. We take these results to show that -er was not identified as a morpheme in ersheet, thus indicating that suffix identification is position specific. This conclusion is in line with data on interference effects in nonword rejection and strongly constrains theoretical proposals on how complex words are identified. In particular, because these findings were reported in a masked priming paradigm, they suggest that positional constraints operate early, most likely at a prelexical level of morpho-orthographic analysis.

  8. Generic hierarchical engine for mask data preparation

    Science.gov (United States)

    Kalus, Christian K.; Roessl, Wolfgang; Schnitker, Uwe; Simecek, Michal

    2002-07-01

    Electronic layouts are usually flattened on their path from the hierarchical source downstream to the wafer. Mask data preparation has certainly been identified as a severe bottleneck since long. Data volumes are not only doubling every year along the ITRS roadmap. With the advent of optical proximity correction and phase-shifting masks data volumes are escalating up to non-manageable heights. Hierarchical treatment is one of the most powerful means to keep memory and CPU consumption in reasonable ranges. Only recently, however, has this technique acquired more public attention. Mask data preparation is the most critical area calling for a sound infrastructure to reduce the handling problem. Gaining more and more attention though, are other applications such as large area simulation and manufacturing rule checking (MRC). They all would profit from a generic engine capable to efficiently treat hierarchical data. In this paper we will present a generic engine for hierarchical treatment which solves the major problem, steady transitions along cell borders. Several alternatives exist how to walk through the hierarchy tree. They have, to date, not been thoroughly investigated. One is a bottom-up attempt to treat cells starting with the most elementary cells. The other one is a top-down approach which lends itself to creating a new hierarchy tree. In addition, since the variety, degree of hierarchy and quality of layouts extends over a wide range a generic engine has to take intelligent decisions when exploding the hierarchy tree. Several applications will be shown, in particular how far the limits can be pushed with the current hierarchical engine.

  9. Evaluating model parameterizations of submicron aerosol scattering and absorption with in situ data from ARCTAS 2008

    Directory of Open Access Journals (Sweden)

    M. J. Alvarado

    2016-07-01

    Full Text Available Accurate modeling of the scattering and absorption of ultraviolet and visible radiation by aerosols is essential for accurate simulations of atmospheric chemistry and climate. Closure studies using in situ measurements of aerosol scattering and absorption can be used to evaluate and improve models of aerosol optical properties without interference from model errors in aerosol emissions, transport, chemistry, or deposition rates. Here we evaluate the ability of four externally mixed, fixed size distribution parameterizations used in global models to simulate submicron aerosol scattering and absorption at three wavelengths using in situ data gathered during the 2008 Arctic Research of the Composition of the Troposphere from Aircraft and Satellites (ARCTAS campaign. The four models are the NASA Global Modeling Initiative (GMI Combo model, GEOS-Chem v9-02, the baseline configuration of a version of GEOS-Chem with online radiative transfer calculations (called GC-RT, and the Optical Properties of Aerosol and Clouds (OPAC v3.1 package. We also use the ARCTAS data to perform the first evaluation of the ability of the Aerosol Simulation Program (ASP v2.1 to simulate submicron aerosol scattering and absorption when in situ data on the aerosol size distribution are used, and examine the impact of different mixing rules for black carbon (BC on the results. We find that the GMI model tends to overestimate submicron scattering and absorption at shorter wavelengths by 10–23 %, and that GMI has smaller absolute mean biases for submicron absorption than OPAC v3.1, GEOS-Chem v9-02, or GC-RT. However, the changes to the density and refractive index of BC in GC-RT improve the simulation of submicron aerosol absorption at all wavelengths relative to GEOS-Chem v9-02. Adding a variable size distribution, as in ASP v2.1, improves model performance for scattering but not for absorption, likely due to the assumption in ASP v2.1 that BC is present at a constant mass

  10. The development of biopolymer-based nanostructured materials : plastics, gels, IPNs and nanofoams

    NARCIS (Netherlands)

    Soest, van J.J.G.

    2006-01-01

    The ability to design products with structural features on a nanometric scale is a major technology driver in materials research Nanostructured materials are defined as materials with structural features on a sub-micron scale determining specific properties They consist of materials such as metals,

  11. Computer-assisted area detector masking

    Energy Technology Data Exchange (ETDEWEB)

    Wright, Christopher J.; Zhou, Xiao-Dong (SC)

    2017-01-30

    Area detectors have become the predominant type of detector for the rapid acquisition of X-ray diffraction, small-angle scattering and total scattering. These detectors record the scattering for a large area, giving each shot good statistical significance to the resulting scattered intensityI(Q) pattern. However, many of these detectors have pixel level defects, which cause error in the resulting one-dimensional patterns. In this work, new software to automatically find and mask these dead pixels and other defects is presented. This algorithm is benchmarked with both ideal simulated and experimental datasets.

  12. Silicon germanium mask for deep silicon etching

    KAUST Repository

    Serry, Mohamed

    2014-07-29

    Polycrystalline silicon germanium (SiGe) can offer excellent etch selectivity to silicon during cryogenic deep reactive ion etching in an SF.sub.6/O.sub.2 plasma. Etch selectivity of over 800:1 (Si:SiGe) may be achieved at etch temperatures from -80 degrees Celsius to -140 degrees Celsius. High aspect ratio structures with high resolution may be patterned into Si substrates using SiGe as a hard mask layer for construction of microelectromechanical systems (MEMS) devices and semiconductor devices.

  13. Use of simulation to optimize the pinhole diameter and mask thickness for an x-ray backscatter imaging system

    Science.gov (United States)

    Vella, A.; Munoz, Andre; Healy, Matthew J. F.; Lane, David; Lockley, D.

    2017-08-01

    The PENELOPE Monte Carlo simulation code was used to determine the optimum thickness and aperture diameter of a pinhole mask for X-ray backscatter imaging in a security application. The mask material needs to be thick enough to absorb most X-rays, and the pinhole must be wide enough for sufficient field of view whilst narrow enough for sufficient image spatial resolution. The model consisted of a fixed geometry test object, various masks with and without pinholes, and a 1040 x 1340 pixels' area detector inside a lead lined camera housing. The photon energy distribution incident upon masks was flat up to selected energy limits. This artificial source was used to avoid the optimisation being specific to any particular X-ray source technology. The pixelated detector was modelled by digitising the surface area represented by the PENELOPE phase space file and integrating the energies of the photons impacting within each pixel; a MATLAB code was written for this. The image contrast, signal to background ratio, spatial resolution, and collimation effect were calculated at the simulated detector as a function of pinhole diameter and various thicknesses of mask made of tungsten, tungsten/epoxy composite or bismuth alloy. A process of elimination was applied to identify suitable masks for a viable X-ray backscattering security application.

  14. Contribution of EUV mask CD variability on LCDU

    Science.gov (United States)

    Qi, Zhengqing John; Rankin, Jed; Sun, Lei; Levinson, Harry

    2017-03-01

    The shrink in feature sizes enabled by EUV lithography introduces a regime where stochastic limits to resolution can manifest in the form of line edge roughness (LER) for line/space patterns and local critical dimension uniformity (LCDU) for contact/holes. To meet increasing tolerances on edge placement error (EPE) and suppression of stochastic effects, an understanding of EUV mask contributions on lithographic patterning variability is essential. The work here explores stochastic noise originating from the mask patterning process and attempts to quantify its contributions towards on-wafer LCDU. A semiempirical approach was used to statistically decompose the mask variability component from the measured LCDU and provide a first-order understanding of the mask's impact on wafer. Taking a more direct approach, a one-to-one correlation of local CD variation between mask and wafer was also experimentally shown, presenting the possibility for predicting the contributions and impact of mask LCDU on wafer prior to exposure.

  15. Mask ventilation, hypocapnia, and seizure duration in electroconvulsive therapy.

    Science.gov (United States)

    Choukalas, Christopher G; Walter, James; Glick, David; O'Connor, Michael F; Tung, Avery; Dinwiddie, Stephen H; Nunnally, Mark E

    2010-09-01

    To compare the Mapleson D circuit and the bag-valve-mask device for mask ventilation of patients undergoing electroconvulsive therapy (ECT). Cross-over study. Single-center academic medical center. 18 patients undergoing ECT for major depressive disorder. Patients were randomized to undergo mask ventilation by the Mapleson D circuit or the bag-valve-mask device. End-tidal CO(2), seizure duration, and airway pressure values were recorded. End-tidal CO(2) was significantly lower with the bag-valve-mask device. When compared with the bag-valve-mask device, ventilation with the Mapleson circuit resulted in rebreathing of CO(2) in nearly all patients, shorter expiratory time, and lower pressure ramp slope. Hypocapnia was not associated with longer seizures, and the user-device interaction might affect device performance. Copyright © 2010 Elsevier Inc. All rights reserved.

  16. Acoustical Masks and sound aspects of Ancient Greek Theatre

    Directory of Open Access Journals (Sweden)

    Thanos Vovolis

    2012-07-01

    Full Text Available It is impossible to imagine the ancient Greek theatre without the mask, whether it is tragedy, comedy or satyr plays. All theatrical forms that developed in Athens during the 6th and 5th centuries BC were forms of masked drama. The mask was an organic element in this new form called theatre because the mask is the medium per excellence for the embodiment of the Other and participates in the creation of the stage as a site of the dialogue between the Self andthe Other. But the mask was an organic element of the theatre because in ancient Greek theatre the mask is organically connected through its facial appearance to the ecstatic cries found in the dramatic texts and to the theatre space through its acoustical form. Acoustics permeated all aspects of the ancient Greek theatre and was a way to create even better participation for the audience enhancing its acoustico-visual and synaesthetic experience.

  17. Constellation-masked secure communication technique for OFDM-PON.

    Science.gov (United States)

    Liu, Bo; Zhang, Lijia; Xin, Xiangjun; Yu, Jianjun

    2012-10-22

    This paper proposes a novel secure communication technique using constellation masking for applications in orthogonal frequency division multiplexing passive optical network (OFDM-PON). The constellation masking is applied both on each subcarrier and among different subcarriers. The Arnold mapping is utilized as the parameter function for the mask factors. A interleave length is employed to provide a scalable masking granularity for different ONUs. A 15.54 Gb/s constellation-masked 32QAM-OFDM signal has been successfully transmitted over 25-km single mode fiber in the experiment. Experimental results show that the proposed scheme can effectively protect the system from illegal ONU without wasting the bandwidth. The constellation-masked technique suggests an effective solution for the physical secure communication in future OFDM access network.

  18. Airflow-Restricting Mask Reduces Acute Performance in Resistance Exercise

    OpenAIRE

    Yuri L. Motoyama; Gustavo B. Joel; Paulo E. A. Pereira; Gilmar J. Esteves; Azevedo, Paulo H.S.M.

    2016-01-01

    Background: The aim of this study was to compare the number of repetitions to volitional failure, the blood lactate concentration, and the perceived exertion to resistance training with and without an airflow-restricting mask. Methods: Eight participants participated in a randomized, counterbalanced, crossover study. Participants were assigned to an airflow-restricting mask group (MASK) or a control group (CONT) and completed five sets of chest presses and parallel squats until failure at 75%...

  19. Scanning spot metrology for testing of photolithographic masks

    OpenAIRE

    Blattner, Peter; Herzig, Hans-Peter; Sohail, S; Naqvi, H.

    2007-01-01

    We investigated an optical method for characterizing submicrometer structures of photolithographic masks, enabling fast and non-destructive testing over large areas. The scanning spot metrology provides accurate information about edge locations of opaque structures on chrome masks. Algorithms for the extraction of edge locations from the detector signal are discussed and applied to the characterization of a modulated grating mask. Local fabrication errors of the order of 10 to 50 nm can be de...

  20. Taste masking of diclofenac sodium using microencapsulation.

    Science.gov (United States)

    Al-Omran, M F; Al-Suwayeh, S A; El-Helw, A M; Saleh, S I

    2002-01-01

    This study addresses how to mask the undesirable taste of diclofenac sodium (DS) without interfering with an adequate rate of drug release. DS microcapsules were successfully prepared using a system of ethylcellulose (EC)-toluene-petroleum ether. The system was optimized by the construction of the phase diagram and determination of the amount of EC precipitated under different solvent:non-solvent ratios to determine the most appropriate conditions for preparing good microcapsules. Microcrystalline cellulose (Avicel) and lactose were mixed with DS powder and converted into spherical cores by the wet agglomeration technique which facilitated coacervation and formation of thin and uniform microcapsule walls. Diethylphthalate (DEP) and Polyethyleneglycol 600 (PEG) in different concentrations (20 or 40% w/w) were used as plasticizers to impart better elasticity to the microcapsules. The microcapsules were evaluated for DS released against crushed commercial DS enteric coated tablet (Voltaren). The prepared microcapsules were taste evaluated by a taste panel of 10 volunteers. The results revealed that the optimum solvent:non-solvent ratio required for microcapsule formation was 1:2. Microcapsules containing PEG 20% or DEP 40% showed a faster rate of DS release compared to that obtained from other microcapsules and crushed commercial enteric coated tablets (Voltaren). The palatability and the taste of DS were significantly improved by microencapsulation. The extent of taste masking was influenced by the microcapsule core:wall ratio, the presence of additives within the core, the type and concentration of plasticizer and initial core size.

  1. Influence of locational states of submicron fibers added into matrix on mechanical properties of plain-woven Carbon Fiber Composite

    Science.gov (United States)

    Kumamoto, Soichiro; Okubo, Kazuya; Fujii, Toru

    2016-01-01

    The aim of this study was to show the influence of locational states of submicron fibers added into epoxy matrix on mechanical properties of modified plane-woven carbon fiber reinforced plastic (CFRP). To change the locational states of submicron fibers, two kinds of fabrication processes were applied in preparing specimen by hand lay-up method. Submicron fibers were simply added into epoxy resin with ethanol after they were stirred by a dispersion process using homogenizer to be located far from the interface between reinforcement and matrix. In contrast, submicron fibers were attached onto the carbon fibers by injecting from a spray nozzle accompanying with ethanol to be located near the interface, after they were tentatively contained in ethanol. The plain-woven CFRP plates were fabricated by hand lay-up method and cured at 80 degree-C for 1 hour and then at 150 degree-C for 3 hours. After curing, the plain-woven CFRP plates were cut into the dimension of specimen. Tensile shear strength and Mode-II fracture toughness of CFRP were determined by tensile lap-shear test and End-notched flexure(ENF) test, respectively. When submicron fibers were located far from the interface between carbon fibers and epoxy resin, tensile shear strength and Mode-II fracture toughness of CFRP were improved 30% and 18% compared with those of unmodified case. The improvement ratio in modified case was rather low (about few percentages) in the case where submicron fibers were located near the interface. The result suggested that crack propagation should be prevented when submicron fibers were existed far from the interface due to the effective stress state around the crack tip.

  2. Influence of locational states of submicron fibers added into matrix on mechanical properties of plain-woven Carbon Fiber Composite

    Directory of Open Access Journals (Sweden)

    Kumamoto Soichiro

    2016-01-01

    Full Text Available The aim of this study was to show the influence of locational states of submicron fibers added into epoxy matrix on mechanical properties of modified plane-woven carbon fiber reinforced plastic (CFRP. To change the locational states of submicron fibers, two kinds of fabrication processes were applied in preparing specimen by hand lay-up method. Submicron fibers were simply added into epoxy resin with ethanol after they were stirred by a dispersion process using homogenizer to be located far from the interface between reinforcement and matrix. In contrast, submicron fibers were attached onto the carbon fibers by injecting from a spray nozzle accompanying with ethanol to be located near the interface, after they were tentatively contained in ethanol. The plain-woven CFRP plates were fabricated by hand lay-up method and cured at 80 degree-C for 1 hour and then at 150 degree-C for 3 hours. After curing, the plain-woven CFRP plates were cut into the dimension of specimen. Tensile shear strength and Mode-II fracture toughness of CFRP were determined by tensile lap-shear test and End-notched flexure(ENF test, respectively. When submicron fibers were located far from the interface between carbon fibers and epoxy resin, tensile shear strength and Mode-II fracture toughness of CFRP were improved 30% and 18% compared with those of unmodified case. The improvement ratio in modified case was rather low (about few percentages in the case where submicron fibers were located near the interface. The result suggested that crack propagation should be prevented when submicron fibers were existed far from the interface due to the effective stress state around the crack tip.

  3. Visually lossless coding based on temporal masking in human vision

    Science.gov (United States)

    Adzic, Velibor; Hock, Howard S.; Kalva, Hari

    2014-02-01

    This paper presents a method for perceptual video compression that exploits the phenomenon of backward temporal masking. We present an overview of visual temporal masking and discuss models to identify portions of a video sequences masked due to this phenomenon exhibited by the human visual system. A quantization control model based on the psychophysical model of backward visual temporal masking was developed. We conducted two types of subjective evaluations and demonstrated that the proposed method up to 10% bitrate savings on top of state of the art encoder with visually identical video. The proposed methods were evaluated using HEVC encoder.

  4. Recent patents and patented technology platforms for pharmaceutical taste masking.

    Science.gov (United States)

    Kaushik, Deepak; Dureja, Harish

    2014-04-01

    Taste masking is an important factor in the development of oral dosage forms containing bitter active pharmaceutical ingredients. Currently numerous techniques are being applied to overcome this problem. Realizing this, several researchers and pharmaceutical companies are now engaged in developing novel techniques to address the problem of taste masking evident by numerous patents filed in this area in recent times. In this review the most recent patents for taste masking are discussed and how these patents overcome the limitations of conventional approaches of taste masking is also highlighted. Novel techniques based on some recent patents such as nanohybrid, melt extrusion, non-complex cyclodextrin compositions and off taste masking are providing new realms to taste masking of bitter drugs. The present article also provides an overview of various patented platform technologies based on different techniques/mechanisms employed for taste masking. The unique features and principles of taste-masking approaches used in various patented technologies are also discussed. A better understanding of these new patents and patented technologies will help researchers and pharmaceutical industries to select the appropriate platform, or to develop innovative products with improved taste masking properties.

  5. Estimation of the Ideal Binary Mask using Directional Systems

    DEFF Research Database (Denmark)

    Boldt, Jesper; Kjems, Ulrik; Pedersen, Michael Syskind

    2008-01-01

    The ideal binary mask is often seen as a goal for time-frequency masking algorithms trying to increase speech intelligibility, but the required availability of the unmixed signals makes it difficult to calculate the ideal binary mask in any real-life applications. In this paper we derive the theory...... and the requirements to enable calculations of the ideal binary mask using a directional system without the availability of the unmixed signals. The proposed method has a low complexity and is verified using computer simulation in both ideal and non-ideal setups showing promising results....

  6. Contrast ratios and masking ability of three types of ceramic veneers.

    Science.gov (United States)

    Chu, Frederick C S; Chow, Tak W; Chai, John

    2007-11-01

    Although ceramic veneers have been proven to be clinically successful in longevity studies, there is little information on the contrast ratios and masking ability of the available ceramic systems because dental laboratory technology and expensive experimental equipment are required for the investigation. Moreover, the complexity in understanding how to evaluate translucent ceramic materials may also explain why information in this area is limited. The purpose of this study was to determine the contrast ratios and masking abilities of 3 types of all-ceramic veneers by measuring their luminance and color difference over white and black backgrounds. Disk-shaped specimens (8-mm diameter x 0.7-mm thickness) of Shade A2 (Vita Lumin) of 3 types of all-ceramic systems: Procera (n=8), Empress 2 (n=8), and Vitadur Alpha (n=10) were fabricated. The luminance (as Y) and color (as CIE L*a*b*) of the specimens were measured with a colorimeter. The contrast ratio (CR=Yb/Yw), defined as the ratio of illuminance (Y) of the test material when it is placed on the black background (Yb) to the illuminance of the same material when it is placed over a white background (Yw), was determined. The masking ability of a specimen was evaluated by calculating the color difference (DeltaE) of the veneers over white and black backgrounds. Both CR and DeltaE* data were analyzed with 1-way ANOVA and the Tukey HSD test (alpha=.05). The mean contrast ratios (SD) of Procera, Empress 2, and Vitadur Alpha specimens were 0.50 (0.02), 0.46 (0.05), and 0.39 (0.02), respectively. CR values were significantly different among the 3 materials (Pveneers had a significantly higher CR compared to Empress 2 (P=.01) or Vitadur Alpha (P=.01), whereas the CR of Empress 2 was significantly higher than that of Vitadur Alpha (P=.046). Color difference (DeltaE*) (SD) of Procera, Empress 2, and Vitadur Alpha specimens over black and white backgrounds were 24.46 (1.03), 25.80 (1.03), and 31.08 (1.19), respectively. Delta

  7. The Effect of Submicron Second-Phase Particles on the Rate of Grain Refinement in a Copper-Oxygen Alloy During Cold Spray

    Science.gov (United States)

    Zhang, Yinyin; Brodusch, Nicolas; Descartes, Sylvie; Shockley, J. Michael; Gauvin, Raynald; Chromik, Richard R.

    2017-10-01

    The effect of non-deformable submicron second-phase particles ( d = 200-500 nm) on microstructural refinement during cold spray was examined. Using single particle impact testing, two types of splats were fabricated using two different feedstocks: a Cu-0.21wt.%O powder containing Cu2O second-phase particles and a single-phase Cu. Microstructural evolution analysis using high-resolution electron backscatter diffraction shows grain refinement occurred at a higher rate in the Cu-0.21wt.%O powder. That was due to dynamic recrystallization initiated by particle-stimulated nucleation (PSN). High-strain-rate deformation of cold spray was found to be the key to activate PSN. The present study suggests cold spray is a possible technique to fabricate ultrafine-grained materials by using feedstock containing second-phase particles.

  8. A randomised trial comparing the laryngeal mask airway Supreme™ with the laryngeal mask airway Unique™ in children.

    Science.gov (United States)

    Jagannathan, N; Sohn, L E; Sawardekar, A; Chang, E; Langen, K E; Anderson, K

    2012-02-01

    We conducted a randomised controlled trial comparing the laryngeal mask airway Supreme(™) with the laryngeal mask airway Unique(™) in children. Fifty children presenting for elective surgery were randomly assigned to receive either the laryngeal mask airway Supreme or laryngeal mask airway Unique. The outcomes measured were airway leak pressure, ease and time for insertion, insertion success rate, fibreoptic examination, incidence of gastric insufflation, ease of gastric tube placement through the laryngeal mask airway Supreme, quality of airway during anaesthetic maintenance and complications. Median (IQR [range]) time to successful device placement was shorter with the laryngeal mask airway Unique, 14.5 [13.5-16.3 (10.0-23.6)] s than with the laryngeal mask airway Supreme, 17.4 [14.8-19.8 (11.5-29.2)] s; p = 0.007. Median (IQR [range]) airway leak pressures for the laryngeal mask airway Supreme and laryngeal mask airway Unique were 20 [16-21 (12-22)] cmH(2)O and 15 [14-18 (10-24)] cmH(2)O, respectively (p = 0.001). The incidence of gastric insufflation was lower with the laryngeal mask airway Supreme (zero vs six patients), p = 0.01. In conclusion, the laryngeal mask airway Supreme performed as well as the laryngeal mask airway Unique and is a useful alternative for airway maintenance, particularly in children who require evacuation of gastric contents during anaesthesia. Anaesthesia © 2011 The Association of Anaesthetists of Great Britain and Ireland.

  9. Technology Insertion Engineering Services Masking Process Evaluation Task Order No. 7. (Phase 1). Revision B

    Science.gov (United States)

    1989-10-06

    protection during in- plant handling and processing . engineering consultation services Complete machine facility for the manufacture of molds, plating and...RESPIRA709Y PROTECTOW If TLV is exceeded, a NIOS’-opproved seif-contained breathig oppat, positive pressre hose mnask or ok line mask Is advised. These shmda...illustrates the description for a typical Obviously, any material that has previously proven order. satisfactory in a particular application at your plant

  10. EFFECT OF MASKED REGIONS ON WEAK-LENSING STATISTICS

    Energy Technology Data Exchange (ETDEWEB)

    Shirasaki, Masato; Yoshida, Naoki [Department of Physics, University of Tokyo, Tokyo 113-0033 (Japan); Hamana, Takashi, E-mail: masato.shirasaki@utap.phys.s.u-tokyo.ac.jp [National Astronomical Observatory of Japan, Tokyo 181-0015 (Japan)

    2013-09-10

    Sky masking is unavoidable in wide-field weak-lensing observations. We study how masks affect the measurement of statistics of matter distribution probed by weak gravitational lensing. We first use 1000 cosmological ray-tracing simulations to examine in detail the impact of masked regions on the weak-lensing Minkowski Functionals (MFs). We consider actual sky masks used for a Subaru Suprime-Cam imaging survey. The masks increase the variance of the convergence field and the expected values of the MFs are biased. The bias then compromises the non-Gaussian signals induced by the gravitational growth of structure. We then explore how masks affect cosmological parameter estimation. We calculate the cumulative signal-to-noise ratio (S/N) for masked maps to study the information content of lensing MFs. We show that the degradation of S/N for masked maps is mainly determined by the effective survey area. We also perform simple {chi}{sup 2} analysis to show the impact of lensing MF bias due to masked regions. Finally, we compare ray-tracing simulations with data from a Subaru 2 deg{sup 2} survey in order to address if the observed lensing MFs are consistent with those of the standard cosmology. The resulting {chi}{sup 2}/n{sub dof} = 29.6/30 for three combined MFs, obtained with the mask effects taken into account, suggests that the observational data are indeed consistent with the standard {Lambda}CDM model. We conclude that the lensing MFs are a powerful probe of cosmology only if mask effects are correctly taken into account.

  11. [Nasal submicron emulsion of Scutellariae Radix extract preparation technology research based on phase transfer of solute technology].

    Science.gov (United States)

    Shi, Ya-jun; Shi, Jun-hui; Chen, Shi-bin; Yang, Ming

    2015-07-01

    Based on the demand of nasal drug delivery high drug loadings, using the unique phase transfer of solute, integrating the phospholipid complex preparation and submicron emulsion molding process of Scutellariae Radix extract, the study obtained the preparation of the high drug loadings submicron emulsion of Scutellariae Radix extract. In the study of drug solution dispersion method, the uniformity of drug dispersed as the evaluation index, the traditional mixing method, grinding, homogenate and solute phase transfer technology were investigated, and the solute phase transfer technology was adopted in the last. With the adoption of new technology, the drug loading capacity reached 1.33% (phospholipid complex was 4%). The drug loading capacity was improved significantly. The transfer of solute method and timing were studied as follows,join the oil phase when the volume of phospholipid complex anhydrous ethanol solution remaining 30%, the solute phase transfer was completed with the continued recycling of anhydrous ethanol. After drug dissolved away to oil phase, the preparation technology of colostrum was determined with the evaluation index of emulsion droplet form. The particle size of submicron emulsion, PDI and stability parameters were used as evaluation index, orthogonal methodology were adopted to optimize the submicron emulsion ingredient and main influential factors of high pressure homogenization technology. The optimized preparation technology of Scutellariae Radix extract nasal submicron emulsion is practical and stable.

  12. Experimental Investigations of the Physical and Optical Properties of Individual Micron/Submicron-Size Dust Grains in Astrophysical Environments

    Science.gov (United States)

    Abbas, M. M.; Tankosic, D.; LeClair, A.

    2014-01-01

    Dust grains constitute a significant component of matter in the universe, and play an important and crucial role in the formation and evolution of the stellar/planetary systems in interstellar dust clouds. Knowledge of physical and optical properties of dust grains is required for understanding of a variety of processes in astrophysical and planetary environments. The currently available and generally employed data on the properties of dust grains is based on bulk materials, with analytical models employed to deduce the corresponding values for individual small micron/submicron-size dust grains. However, it has been well-recognized over a long period, that the properties of individual smallsize dust grains may be very different from those deduced from bulk materials. This has been validated by a series of experimental investigations carried out over the last few years, on a laboratory facility based on an Electrodynamic Balance at NASA, which permits levitation of single small-size dust grains of desired composition and size, in vacuum, in simulated space environments. In this paper, we present a brief review of the results of a series of selected investigations carried out on the analogs of interstellar and planetary dust grains, as well as dust grains obtained by Apollo-l1-17 lunar missions. The selected investigations, with analytical results and discussions, include: (a) Direct measurements of radiation on individual dust grains (b) Rotation and alignments of dust grains by radiative torque (c) Charging properties of dust grains by: (i) UV Photo-electric emissions (ii) Electron Impact. The results from these experiments are examined in the light of the current theories of the processes involved.

  13. A novel inlet system for online chemical analysis of semi-volatile submicron particulate matter

    Science.gov (United States)

    Eichler, P.; Müller, M.; D'Anna, B.; Wisthaler, A.

    2015-03-01

    We herein present a novel modular inlet system designed to be coupled to low-pressure gas analyzers for online chemical characterization of semi-volatile submicron particles. The "chemical analysis of aerosol online" (CHARON) inlet consists of a gas-phase denuder for stripping off gas-phase analytes, an aerodynamic lens for particle collimation combined with an inertial sampler for the particle-enriched flow and a thermodesorption unit for particle volatilization prior to chemical analysis. The denuder was measured to remove gas-phase organics with an efficiency > 99.999% and to transmit particles in the 100-750 nm size range with a 75-90% efficiency. The measured average particle enrichment factor in the subsampling flow from the aerodynamic lens was 25.6, which is a factor of 3 lower than the calculated theoretical optimum. We coupled the CHARON inlet to a proton-transfer-reaction time-of-flight mass spectrometer (PTR-ToF-MS) which quantitatively detects most organic analytes and ammonia. The combined CHARON-PTR-ToF-MS setup is thus capable of measuring both the organic and the ammonium fraction in submicron particles in real time. Individual organic compounds can be detected down to levels of 10-20 ng m-3. Two proof-of-principle studies were carried out for demonstrating the analytical power of this new instrumental setup: (i) oxygenated organics and their partitioning between the gas and the particulate phase were observed from the reaction of limonene with ozone and (ii) nicotine was measured in cigarette smoke particles demonstrating that selected organic target compounds can be detected in submicron particles in real time.

  14. Multi-beam mask writer MBM-1000

    Science.gov (United States)

    Matsumoto, Hiroshi; Yamashita, Hiroshi; Tamura, Takao; Ohtoshi, Kenji

    2017-07-01

    Multi-beam mask writer MBM-1000 will be released in Q4 2017 for N5 semiconductor production. Performance of MBM-1000 is under verification and tuning by using alpha tool upgraded to high-volume manufacturing (HVM) system. It is designed to realize better resolution and higher throughput than EBM-9500, our latest variable-shaped-beam writer, at shot count higher than 500 Gshot/pass. Writing test after upgrade confirmed that MBM-1000 has better beam resolution than EBM-9500 as expected by optics design. It also showed that position of beam array projected on target was stable during one hour writing enough to accomplish registration target. Design of data transfer system and BAA for 300-Gbps data rate is described.

  15. Bilateral Advantages in Subitizing With Visual Masking.

    Science.gov (United States)

    Pryor, Campbell G; Howe, Piers D L

    2015-01-01

    Performance on a range of visual-processing tasks has been shown to improve when information is split bilaterally across the left and right visual hemifields rather than being restricted to a single visual hemifield. However, a recent study by Delvenne et al. found no such bilateral advantage for subitizing, which is our ability to rapidly and accurately enumerate small quantities of objects. This finding is particularly surprising, as it contradicts the prediction of FINgers of INSTantiation theory that subitizing should benefit from bilateral presentation. Our study investigated the issue by determining if there are any circumstances where a bilateral advantage for subitization occurs. Contrary to Delvenne et al., we found that subitizing could show bilateral advantages, but only when the display was backward-masked. We discuss these findings in relation to how the rate of encoding and the time available for this encoding may affect bilateral advantages in subitizing. A general model is proposed under which bilateral advantages could be explained.

  16. Optical Response to Submicron Digital Elements Simulated by FDTD Wavelets with Refractive Impulse

    Directory of Open Access Journals (Sweden)

    Antony J. Bourdillon

    2014-01-01

    Full Text Available Accurate simulation from digital, submicron, optical elements is obtained by finite difference time domain (FDTD results that are phase analyzed as sources for Huygens wavelets on fine scales much shorter than the wavelength used. Results, from the MIT electromagnetic evaluation program, are renormalized by a method here called “refractive impulse.” This is valid for polarized responses from digital diffractive and focusing optics. The method is employed with plane wave incidence at any angle or with diverging or converging beams. It is more systematic, more versatile, and more accurate than commercial substitutes.

  17. Reduced impact of induced gate noise on inductively degenerated LNAs in deep submicron CMOS technologies

    DEFF Research Database (Denmark)

    Rossi, P.; Svelto, F.; Mazzanti, A.

    2005-01-01

    Designers of radio-frequency inductively-degenerated CMOS low-noise-amplifiers have usually not followed the guidelines for achieving minimum noise figure. Nonetheless, state-of-the- art implementations display noise figure values very close to the theoretical minimum. In this paper, we point out...... that this is due to the effect of the parasitic overlap capacitances in the MOS device. In particular, we show that overlap capacitances lead to a significant induced-gate-noise reduction, especially when deep sub-micron CMOS processes are used....

  18. Note: Aligned deposition and modal characterization of micron and submicron poly(methyl methacyrlate) fiber cantilevers.

    Science.gov (United States)

    Nain, Amrinder S; Filiz, Sinan; Ozdoganlar, O Burak; Sitti, Metin; Amon, Cristina

    2010-01-01

    Polymeric micro-/nanofibers are finding increasing use as sensors for novel applications. Here, we demonstrate the ability to deposit an array of poly(methyl methacyrlate) fibers with micron and submicron diameters in aligned configurations on customized piezoelectric shakers. Using lateral motion of an atomic force microscope tip, fibers are broken to obtain fiber cantilevers of high aspect ratio (length/diameter > 20). The resonant frequencies of fabricated microfiber cantilevers are experimentally measured using a laser Doppler vibrometer. An average Young's modulus of 3.5 GPa and quality factor of 20 were estimated from the experimentally obtained frequency responses.

  19. Pressing Induced Polymorphic Phase Transition in Submicron-Sized Gamma-Hmx

    Science.gov (United States)

    Lee, K.-Y.; Moore, D. S.

    2007-12-01

    Using Raman spectroscopy, a novel submicron-sized HMX (sm-HMX) was determined to be both the gamma polymorph and stable with respect to conversion to beta-HMX under ambient conditions for at least a year. Pressing of sm-HMX powder in a small diameter pellet press at pressures from 10,000 psi to 31,000 psi and 1 to 5 minute hold times was found to promote the gamma to beta polymorphic phase transition. The fraction converted and rate of conversion versus time after pellet removal from the press, measured using Raman spectroscopy, fit a sigmoidal curve, indicating nucleation and growth as a possible polymorphic transition mechanism.

  20. Bloch-wave engineered submicron-diameter quantum-dot micropillars for cavity QED experiments

    DEFF Research Database (Denmark)

    Gregersen, Niels; Lermer, Matthias; Reitzenstein, Stephan

    2013-01-01

    The semiconductor micropillar is attractive for cavity QED experiments. For strong coupling, the figure of merit is proportional to Q/√V, and a design combining a high Q and a low mode volume V is thus desired. However, for the standard submicron diameter design, poor mode matching between the ca...... the cavity and the DBR Bloch mode limits the Q. We present a novel adiabatic design where Bloch-wave engineering is employed to improve the mode matching, allowing the demonstration of a record-high vacuum Rabi splitting of 85 μeV and a Q of 13600 for a 850 nm diameter micropillar....

  1. Submicron/nano-structured icephobic surfaces made from fluorinated polymethylsiloxane and octavinyl-POSS

    Energy Technology Data Exchange (ETDEWEB)

    Li, Yancai; Luo, Chenghao; Li, Xiaohui; Zhang, Kaiqiang; Zhao, Yunhui; Zhu, Kongying; Yuan, Xiaoyan, E-mail: yuanxy@tju.edu.cn

    2016-01-01

    Graphical abstract: The submicron/nano-structured morphology induced by OVPOSS has a strong effect on ice attachment. The OVPOSS particles aggregated on the top surface could decrease the ice adhesion strength. - Highlights: • Fluorinated hybrid films were fabricated from PMHS–xFMA and OVPOSS. • The hybrid films presented icephobic surfaces in submicron/nano-structure. • PMHS–17FMA could enhance hydrophobicity rather than icephobic properties. • Proper OVPOSS content (10–15 wt%) favored reducing the ice adhesion strength. • Rougher surface morphology (R{sub q} > 90 nm) was benefit for repelling water droplets. - Abstract: Fluorinated hybrid films composed of fluorinated polymethylsiloxane (PMHS–xFMA, x = 6, 13, 17) and octavinyl-polyhedral oligomeric silsesquioxanes (OVPOSS) were prepared for icephobic applications. PMHS–xFMA with diverse fluorinated side groups were synthesized via hydrosilylation of polymethylhydrosiloxane (PMHS) with fluorinated methacrylate (xFMA), i.e., hexafluorobutyl methacrylate (6FMA), tridecafluorooctyl methacrylate (13FMA) and heptadecafluorodecyl methacrylate (17FMA), respectively. Characterizations of atomic force microscope and scanning electron microscope indicated that surfaces of the hybrid films consisted of submicron/nano-scaled OVPOSS aggregates, and the root-mean-square roughness (S{sub q}) could vary from 42.6 nm to 145.2 nm with various OVPOSS content (5–20 wt%). Wettability measurements of the prepared films demonstrated that the relatively longer fluorinated side groups in PMHS–17FMA were beneficial for decreasing surface energy and enhancing hydrophobic properties. However, the fluorinated hybrid films with PMHS–17FMA presented higher ice shear strengths due to the stronger interfacial interactions between the film surface and ice/water. The film prepared by PMHS–13FMA and 10 wt% of OVPOSS with proper roughness (90.2 nm) performed the lowest ice shear strength (188.2 ± 13.4 kPa) among all the

  2. An Empirical Algorithm for Power Analysis in Deep Submicron Electronic Designs

    Directory of Open Access Journals (Sweden)

    May Huang

    2002-01-01

    Full Text Available An empirical algorithm applied to logic level power analysis in deep submicron VLSI designs is introduced in the paper. The method explores a static analysis strategy using unit functions to represent signal transitions. It can be extended to the use of a Register Transfer Level (RTL power analysis after RTL codes are translated to Boolean equations. A new method for representing state-dependent power models is also introduced in the paper to reduce the complexity of power modeling and to improve the performance of power analysis. The modeling method supports not only the empirical power analysis, but also general simulation-based power analysis methods.

  3. Masking reveals parallel form systems in the visual brain

    Directory of Open Access Journals (Sweden)

    Yu Tung eLo

    2014-07-01

    Full Text Available It is generally supposed that there is a single, hierarchically organized pathway dedicated to form processing, in which complex forms are elaborated from simpler ones, beginning with the orientation-selective cells of V1. In this psychophysical study, we undertook to test another hypothesis, namely that the brain’s visual form system consists of multiple parallel systems and that complex forms are other than the sum of their parts. Inspired by imaging experiments which show that forms of increasing perceptual complexity (lines, angles and rhombuses constituted from the same elements (lines activate the same visual areas (V1, V2 and V3 with the same intensity and latency (Shigihara and Zeki, 2013; 2014, we used backward masking to test the supposition that these forms are processed in parallel. We presented subjects with lines, angles and rhombuses as different target-mask pairs. Evidence in favour of our supposition would be if masking is the most effective when target and mask are processed by the same system and least effective when they are processed in different systems. Our results showed that rhombuses were strongly masked by rhombuses but only weakly masked by lines or angles, but angles and lines were well masked by each other. The relative resistance of rhombuses to masking by low-level forms like lines and angles suggests that complex forms like rhombuses may be processed in a separate parallel system, whereas lines and angles are processed in the same one.

  4. The Role of Polysemy in Masked Semantic and Translation Priming

    Science.gov (United States)

    Finkbeiner, Matthew; Forster, Kenneth; Nicol, Janet; Nakamura, Kumiko

    2004-01-01

    A well-known asymmetry exists in the bilingual masked priming literature in which lexical decision is used: namely, masked primes in the dominant language (L1) facilitate decision times on targets in the less dominant language (L2), but not vice versa. In semantic categorization, on the other hand, priming is symmetrical. In Experiments 1-3 we…

  5. Compressive force applied to a manikin's head during mask ventilation.

    Science.gov (United States)

    van Vonderen, Jeroen J; Kleijn, Ted A; Schilleman, Kim; Walther, Frans J; Hooper, Stuart B; te Pas, Arjan B

    2012-07-01

    To investigate the compressive force applied to the head during mask ventilation and determine whether this force increases in response to an attempt to correct the mask leak. The authors asked 24 participants (consultants, fellows and nurses) to administer positive pressure ventilation to a modified leak-free, term newborn manikin using a self-inflating bag (SIB) and a Neopuff T-piece device. Recordings were made before and after the participants were informed about their percentage of mask leak and asked to correct this. Airway pressure and flow were measured using a Florian monitor, and the force applied to the head was measured using a concealed custom-made load cell weighing scale. There were no differences in the mean (SD) force applied to the head between devices used and before or after the attempt to correct the mask leak (SIB before 2215 (892) and after 2195 (989) g; Neopuff before 1949 (957) and after 2028 (909) g). There was a large variation in force with both devices before and after the attempt (coefficient of variation: SIB before 40% and after 45%; Neopuff before 50% and after 45%). There was no correlation between mask leak and the difference in force used before and after the attempt to correct the mask leak using both devices. During mask ventilation of a manikin, the authors observed that large forces were exerted on the head with either an SIB or a Neopuff, but these forces did not increase during the attempt to minimise the mask leak.

  6. Masked hypertension: evidence of the need to treat

    NARCIS (Netherlands)

    Ogedegbe, Gbenga; Agyemang, Charles; Ravenell, Joseph E.

    2010-01-01

    The diagnosis of masked hypertension has been made easier with the widespread availability of home blood pressure monitoring devices with levels of accuracy comparable to ambulatory blood pressure monitoring. The negative impact of masked hypertension on cardiovascular morbidity and mortality is

  7. Evaluation of mask data preparation with OASIS and P10

    Science.gov (United States)

    Kuriyama, Koki; Machiya, Yuji; Yamasaki, Kiyoshi; Narukawa, Shogo; Hayashi, Naoya

    2005-06-01

    OASIS (Open Artwork System Interchange Standard) is the new stream format to replace conventional GDSII and has become a SEMI standard 2003. Also, some EDA software tools already support OASIS. OASIS can apply not only layout design field but also photomask industory. OASIS is effective to reduce data volume even if it is a fractured data, therefore it is expected to solve file size explosion problem. From mask manufacturer's perspective, it is also necessary to consider mask layout information. In present, there are various kinds of layout information and jobdeck formats. These circumstances require complicated data handling and preparation process at the mask manufacturers. Computerized automatic process needs to be more utilized to eradicate mistakes and miscommunications at the planning department. SEMI standard P10 (Specification of Data Structures for Photomask Orders) is one of the solutions. P10 is basically intended to communicate about mask order data which include layout information. This paper reports the result of evaluation of mask data preparation unified with two SEMI standards: P39 (OASIS) and P10. We have developed a reticle pattern viewer (HOTSCOPE) which can view photomask data with combined OASIS with P10. Figure 1 shows connection between mask data formats, which include OASIS and P10 format with our reticle pattern viewer. HOTSCOPE provides reviewing mask data as a photomask image. It will interface between device manufacturers and mask manufacturers.

  8. Reusable High Aspect Ratio 3-D Nickel Shadow Mask.

    Science.gov (United States)

    Shandhi, M M H; Leber, M; Hogan, A; Warren, D J; Bhandari, R; Negi, S

    2017-04-01

    Shadow Mask technology has been used over the years for resistless patterning and to pattern on unconventional surfaces, fragile substrate and biomaterial. In this work, we are presenting a novel method to fabricate high aspect ratio (15:1) three-dimensional (3D) Nickel (Ni) shadow mask with vertical pattern length and width of 1.2 mm and 40 μm respectively. The Ni shadow mask is 1.5 mm tall and 100 μm wide at the base. The aspect ratio of the shadow mask is 15. Ni shadow mask is mechanically robust and hence easy to handle. It is also reusable and used to pattern the sidewalls of unconventional and complex 3D geometries such as microneedles or neural electrodes (such as the Utah array). The standard Utah array has 100 active sites at the tip of the shaft. Using the proposed high aspect ratio Ni shadow mask, the Utah array can accommodate 300 active sites, 200 of which will be along and around the shaft. The robust Ni shadow mask is fabricated using laser patterning and electroplating techniques. The use of Ni 3D shadow mask will lower the fabrication cost, complexity and time for patterning out-of-plane structures.

  9. Comodulation masking release in bit-rate reduction systems

    DEFF Research Database (Denmark)

    Vestergaard, Martin D.; Rasmussen, Karsten Bo; Poulsen, Torben

    1999-01-01

    It has been suggested that the level dependence of the upper masking slopebe utilised in perceptual models in bit-rate reduction systems. However,comodulation masking release (CMR) phenomena lead to a reduction of themasking effect when a masker and a probe signal are amplitude modulated withthe ...

  10. Mechanisms of Masked Priming: Testing the Entry Opening Model

    Science.gov (United States)

    Wu, Hongmei

    2012-01-01

    Since it was introduced in Forster and Davis (1984), masked priming has been widely adopted in the psycholinguistic research on visual word recognition, but there has been little consensus on its actual mechanisms, i.e. how it occurs and how it should be interpreted. This dissertation addresses two different interpretations of masked priming, one…

  11. The Forming Process Researched in Sandblasting Separation of Masked Silicon Wafers

    Directory of Open Access Journals (Sweden)

    V. V. Zhukov

    2016-01-01

    Full Text Available The object of study is a semiconductor silicon disc-crystal currently used in the design of semiconductor diodes. The disc-crystal is manufactured by the sandblasting separation of a premasked silicon wafer into individual elements. The crystal has frustum-of-a-cone shape with its top diameter determined by a protective masking disc diameter and the bottom one defined by the features of the forming process. The apex angle of the cone 2α or a half-angle α between the lateral surface of the cone and the normal drawn to its base is used as a reference value.The work has studied the influence a thickness of the separated wafer and a width of the gap between the masked discs on the crystal shape. The masking cover is a set of square protective elements (3x3 mm, spaced at 0.6; 0.7; 0.8 and 0.9 mm. The mask material is a self-adhesive PVC-film with thickness of 200 microns. Pilot-plant semi-automatic sandblasting equipment was used to for separation.After processing of results (the angle 2α at the top of the cone the following conclusions have been made:- with increasing thickness of the silicon wafers the gap between the protective discs of mask must be increased;- in case a range of the minimum gaps between the protective discs is within 0.35 - 1.20 mm the half-angle α, which defines the shape of the cut surface, can be considered to be constant and equal to 12º ... 14º.

  12. Effect of Thickness of Zirconia Ceramic on Its Masking Ability: An In Vitro Study.

    Science.gov (United States)

    Tabatabaian, Farhad; Dalirani, Sara; Namdari, Mahshid

    2017-04-28

    Color-masking ability of zirconia ceramics as coping materials has not been clearly understood in zirconia-based restorations. This in vitro study aimed to evaluate the effect of zirconia ceramic thickness on its masking ability, and to define a thickness cutoff for the tested ceramic. Ninety zirconia disc specimens, in nine thickness groups including 0.4, 0.6, 0.8, 1, 1.2, 1.4, 1.6, 1.8, and 2 mm were fabricated. A white substrate and a black substrate were prepared. The disc specimens were placed onto the substrates for spectrophotometric measurements. A spectrophotometer measured L(*) , a(*) , and b(*) color attributes for the specimens. ΔE value was calculated to determine the color difference of specimens on the white and black substrate. Then the ΔE values were compared with an acceptable clinical threshold (ΔE = 5.5) and an ideal threshold (ΔE = 2.6). Welch test, Games-Howell Post Hoc, one-sample t-test, and a regression analysis were performed (p thickness groups of 0.4, 0.6, 0.8, 1, 1.2, 1.4, 1.6, 1.8, and 2 mm were 13.0, 11.9, 9.7, 5.0, 4.2, 3.9, 2.2, 1.9, and 1.5, respectively. A significant difference was found in the ΔE value among the groups (p thickness and the ΔE by the regression analysis (∆E = 25.68e(-1.45 (thickness)) ). The masking ability increased as the zirconia ceramic thickness increased. The tested zirconia ceramic had an acceptable clinical masking ability with a minimum thickness of 1 mm, and an ideal masking ability with a minimum thickness of 1.6 mm. © 2017 by the American College of Prosthodontists.

  13. Effectiveness of activated carbon masks in preventing anticancer drug inhalation.

    Science.gov (United States)

    Sato, Junya; Kogure, Atushi; Kudo, Kenzo

    2016-01-01

    The exposure of healthcare workers to anticancer drugs such as cyclophosphamide (CPA) is a serious health concern. Anticancer drug pollution may spread outside biological safety cabinets even when a closed system is used. The inhalation of vaporized anticancer drugs is thought to be the primary route of exposure. Therefore, it is important that healthcare workers wear masks to prevent inhalation of anticancer drugs. However, the permeability of medical masks to vaporized anticancer drugs has not been examined. Furthermore, the performance differences between masks including activated carbon with chemical adsorptivity and non-activated carbon masks are uncertain. We investigated activated carbon mask permeability to vaporized CPA, and assessed whether inhibition of vaporized CPA permeability was attributable to the masks' adsorption abilities. A CPA solution (4 mg) was vaporized in a chamber and passed through three types of masks: Pleated-type cotton mask (PCM), pleated-type activated carbon mask (PAM), and stereoscopic-type activated carbon mask (SAM); the flow rate was 1.0 L/min for 1 h. The air was then recovered in 50 % ethanol. CPA quantities in the solution were determined by liquid chromatography time-of-flight mass spectrometry. To determine CPA adsorption by the mask, 5 cm 2 of each mask was immersed in 10 mL of CPA solution (50-2500 μg/mL) for 1 h. CPA concentrations were measured by high-performance liquid chromatography with ultraviolet detection. For the control (no mask), 3.735 ± 0.543 μg of CPA was recovered from the aerated solution. Significantly lower quantities were recovered from PCM (0.538 ± 0.098 μg) and PAM (0.236 ± 0.193 μg) ( p  SAM samples were below the quantification limit. When a piece of the SAM was immersed in the CPA solution, a marked decrease to less than 3.1 % of the initial CPA concentration was observed. The SAM exhibited good adsorption ability, and this characteristic may contribute to avoiding

  14. Understanding the trade-offs of thinner binary mask absorbers

    Science.gov (United States)

    Tirapu-Azpiroz, Jaione; McIntyre, Gregory; Faure, Tom; Halle, Scott; Hibbs, Michael; Wagner, Alfred; Lai, Kafai; Gallagher, Emily; Brunner, Timothy

    2010-09-01

    Mask topography is only one of the challenges for extending 193nm immersion lithography to 22nm and beyond. Migration to binary but thinner mask absorbers, from the previously employed attenuated phase-shift mask (attnPSM) technology, traded a tolerable loss in contrast for better mask making performance and reduced electromagnetic field (EMF) impact [1]. The relentless technological advances in 193nm lithography required to enable 22nm technology, however, continue to drive the dimensions of mask features deep into sub-wavelength scale. In this regime, residual mask EMF effects can still degrade the imaging performance of critical mask patterns, often in the form of featuredependent biasing and shifts of the plane of best focus that shrink the common process window and magnify the impact of mask errors. In this paper we investigate the potential benefits in EMF effects mitigation provided by further thinning the mask absorber to the minimum possible while retaining the required opacity. This study was motivated by the narrower process variability bands observed on a 22nm structure with high EMF sensitivity, when computed with rigorous EMF simulations using a thinner absorber. Resist measurements on wafers exposed with the same EMF sensitive structure built on either the standard binary mask or the thinner sample, confirmed the lower sensitivity to mask topography of the latter while also providing a significant process window improvement. We further observed that thinner topography allowed for a smaller topography induced bias, resulting in improved mask manufacturability with less risk for mask corrections to be limited by mask manufacturability rules such as small assist features and small corner to corner gaps. Thinning the absorber, however, is typically accompanied by an increase in reflectivity of the mask blank which may influence the nature of stray light in the imaging system. To understand the consequences of increasing the blank reflectivity, a double

  15. Incorporating mask topography edge diffraction in photolithography simulations

    Science.gov (United States)

    Tirapu-Azpiroz, Jaione; Yablonovitch, Eli

    2006-04-01

    In deep ultraviolet lithography simulations, conventional application of Kirchhoff's boundary conditions on the mask surface provides the so-called "thin-mask" approximation of the object field. Current subwavelength lithographic operation, however, places a serious limitation on this approximation, which fails to account for the topographical, or "thick-mask," effects. In this paper, a new simulation model is proposed that is theoretically founded on the well-established physical theory of diffraction. This model relies on the key result that diffraction effects can be interpreted as an intrinsic edge property, and modeled with just two fixed parameters: width and transmission coefficient of a locally determined boundary layer applied to each chrome edge. The proposed model accurately accounts for thick-mask effects of the fields on the mask, greatly improving the accuracy of aerial image simulations in photolithography, while maintaining a reasonable computational cost.

  16. Task-Dependent Masked Priming Effects in Visual Word Recognition

    Science.gov (United States)

    Kinoshita, Sachiko; Norris, Dennis

    2012-01-01

    A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal: For example, only word targets show priming in the lexical decision task, but both words and non-words do in the same-different task; semantic priming effects are generally weak in the lexical decision task but are robust in the semantic categorization task. We explain how such task dependence arises within the Bayesian Reader account of masked priming (Norris and Kinoshita, 2008), and how the task dissociations can be used to understand the early processes in lexical access. PMID:22675316

  17. Task-dependent masked priming effects in visual word recognition

    Directory of Open Access Journals (Sweden)

    Sachiko eKinoshita

    2012-06-01

    Full Text Available A method used widely to study the first 250 ms of visual word recognition is masked priming: These studies have yielded a rich set of data concerning the processes involved in recognizing letters and words. In these studies, there is an implicit assumption that the early processes in word recognition tapped by masked priming are automatic, and masked priming effects should therefore be invariant across tasks. Contrary to this assumption, masked priming effects are modulated by the task goal: For example, only word targets show priming in the lexical decision task, but both words and nonwords do in the same-different task; semantic priming effects are generally weak in the lexical decision task but are robust in the semantic categorization task. We explain how such task dependence arises within the Bayesian Reader account of masked priming (Norris & Kinoshita, 2008, and how the task dissociations can be used to understand the early processes in lexical access.

  18. Extreme ultraviolet mask substrate surface roughness effects on lithography patterning

    Energy Technology Data Exchange (ETDEWEB)

    George, Simi; Naulleau, Patrick; Salmassi, Farhad; Mochi, Iacopo; Gullikson, Eric; Goldberg, Kenneth; Anderson, Erik

    2010-06-21

    In extreme ultraviolet lithography exposure systems, mask substrate roughness induced scatter contributes to LER at the image plane. In this paper, the impact of mask substrate roughness on image plane speckle is explicitly evaluated. A programmed roughness mask was used to study the correlation between mask roughness metrics and wafer plane aerial image inspection. We find that the roughness measurements by top surface topography profile do not provide complete information on the scatter related speckle that leads to LER at the image plane. We suggest at wavelength characterization by imaging and/or scatter measurements into different frequencies as an alternative for a more comprehensive metrology of the mask substrate/multilayer roughness effects.

  19. Comparing the Laryngeal Mask Airway, Cobra Perilaryngeal Airway and Face Mask in Children Airway Management.

    Science.gov (United States)

    Tekin, Beyza; Hatipoğlu, Zehra; Türktan, Mediha; Özcengiz, Dilek

    2016-04-01

    We compared the effects of the laryngeal mask airway (LMA), face mask and Cobra perilaryngeal airway (PLA) in the airway management of spontaneously breathing paediatric patients undergoing elective inguinal surgery. In this study, 90 cases of 1-14-year-old children undergoing elective inguinal surgery were scheduled. The patients were randomly divided into three groups. Anaesthesia was provided with sevoflurane and 50%-50% nitrous oxide and oxygen. After providing an adequate depth of anaesthesia, supraglottic airway devices were inserted in the group I and II patients. The duration and number of insertion, haemodynamic parameters, plateau and peak inspiratory pressure and positive end-expiratory pressure of the patients were recorded preoperatively, after induction and at 5, 10, 15 and 30 min peroperatively. There were no statistical differences between the groups in terms of haemodynamic parameters (p>0.05). In group II, instrumentation success was higher and instrumentation time was shorter than group II. The positive end-expiratory pressure and plateau and peak inspiratory pressure values were statistically lower in group II (pairway safety and to avoid possible complications, LMA and Cobra PLA could be alternatives to face mask and that the Cobra PLA provided lower airway pressure and had a faster and more easy placement than LMA.

  20. New method of 2-dimensional metrology using mask contouring

    Science.gov (United States)

    Matsuoka, Ryoichi; Yamagata, Yoshikazu; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2008-10-01

    We have developed a new method of accurately profiling and measuring of a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, this edge detection method is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. This method realizes two-dimensional metrology for refined pattern that had been difficult to measure conventionally by utilizing high precision contour profile. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. This is to say, demands for quality is becoming strenuous because of enormous quantity of data growth with increasing of refined pattern on photo mask manufacture. In the result, massive amount of simulated error occurs on mask inspection that causes lengthening of mask production and inspection period, cost increasing, and long delivery time. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method of a DFM solution using two-dimensional metrology for refined pattern.

  1. Airborne studies of submicron aerosol in the troposphere over West Siberia

    Energy Technology Data Exchange (ETDEWEB)

    Panchenko, M.V.; Zuev, V.E.; Belan, B.D.; Terpugova, S.A. [Institute of Atmospheric Optics, Tomsk (Russian Federation)

    1996-04-01

    Submicron fraction particles that have the longest lifespan and are included in almost all atmospheric processes are of special importance among the great variety of sizes of particles present in the atmosphere. Submicron particles mainly determine the opticle state of the atmosphere in the visible spectral range, essentially cause the absorption of infrared radiation and, since they are the products and participants in all aerosol-to-gas transformations, accumulate of a lot of various chemical compounds and transfer them to large distances. Investigation of the processes of the spatial-temporal variability of aerosol particles for different climatic zones of the earth is the experimental base for studying their effect on climatically and ecologically significant factors and estimating their unfavorable tendencies. The increasing anthropogenic loading of the earth`s atmosphere is creating an urgency for aerosol research. Regardless of how perfect the analytical and numerical methods of solving radiation problems may be, success in forecasting climatic change is mainly determined by the reliability of the experimental data on optical parameters of the atmosphere and of the description of their variability under the effect of external factors.

  2. Laser smoothing of sub-micron grooves in hydroxyl-rich fused silica

    Energy Technology Data Exchange (ETDEWEB)

    Shen Nan [Lawrence Livermore National Laboratory, 7000 East Avenue, L-491, Livermore, CA 94550-9234 (United States); Matthews, Manyalibo J., E-mail: ibo@llnl.gov [Lawrence Livermore National Laboratory, 7000 East Avenue, L-491, Livermore, CA 94550-9234 (United States); Fair, James E.; Britten, Jerald A.; Nguyen, Hoang T.; Cooke, Diane; Elhadj, Selim; Yang, Steven T. [Lawrence Livermore National Laboratory, 7000 East Avenue, L-491, Livermore, CA 94550-9234 (United States)

    2010-04-01

    Nano- to micrometer-sized surface defects on UV-grade fused silica surfaces are known to be effectively smoothed through the use of high-temperature localized CO{sub 2} laser heating, thereby enhancing optical properties. However, the details of the mass transport and the effect of hydroxyl content on the laser smoothing of defective silica at sub-micron length scales are still not completely understood. In this study, we examine the morphological evolution of sub-micron, dry-etched periodic surface structures on type II and type III SiO{sub 2} substrates under 10.6 {mu}m CO{sub 2} laser irradiation using atomic force microscopy (AFM). In situ thermal imaging was used to map the transient temperature field across the heated region, allowing assessment of the T-dependent mass transport mechanisms under different laser-heating conditions. Computational fluid dynamics simulations correlated well with experimental results, and showed that for large effective capillary numbers (N{sub c} > 2), surface diffusion is negligible and smoothing is dictated by capillary action, despite the relatively small spatial scales studied here. Extracted viscosity values over 1700-2000 K were higher than the predicted bulk values, but were consistent with the surface depletion of OH groups, which was confirmed using confocal Raman microscopy.

  3. Laser smoothing of sub-micron grooves in hydroxyl-rich fused silica

    Energy Technology Data Exchange (ETDEWEB)

    Shen, N; Matthews, M J; Fair, J E; Britten, J A; Nguyen, H T; Cooke, D; Elhadj, S; Yang, S T

    2009-10-30

    Nano- to micrometer-sized surface defects on UV-grade fused silica surfaces are known to be effectively smoothed through the use of high-temperature localized CO{sub 2} laser heating, thereby enhancing optical properties. However, the details of the mass transport and the effect of hydroxyl content on the laser smoothing of defective silica at submicron length scales is still not completely understood. In this study, we examine the morphological evolution of sub-micron, dry-etched periodic surface structures on type II and type III SiO{sub 2} substrates under 10.6 {micro}m CO{sub 2} laser irradiation using atomic force microscopy (AFM). In-situ thermal imaging was used to map the transient temperature field across the heated region, allowing assessment of the T-dependent mass transport mechanisms under different laser-heating conditions. Computational fluid dynamics simulations correlated well with experimental results, and showed that for large effective capillary numbers (N{sub c} > 2), surface diffusion is negligible and smoothing is dictated by capillary action, despite the relatively small spatial scales studied here. Extracted viscosity values over 1700-2000K were higher than the predicted bulk values, but were consistent with the surface depletion of OH groups, which was confirmed using confocal Raman microscopy.

  4. Accurate submicron edge detection using the phase change of a nano-scale shifting laser spot

    Science.gov (United States)

    Hai, Hoang Hong; Chen, Liang-Chia; Nguyen, Duc Trung; Lin, Shyh-Tsong; Yeh, Sheng Lih; Yao, Ying

    2017-07-01

    Accurate edge detection with lateral super-resolution has been a critical issue in optical measurement because of the barrier imposed by the optical diffraction limit. In this study, a diffraction model that applies scalar diffraction theory of Fresnel-Kirchhoff is developed to simulate phase variance and distribution along edge location. Edge position is detected based on the phase variation that occurs on the edge with a surface step-height jump. To detect accurate edge positioning beyond the optical diffraction limit, a nanopositioning stage is used to scan the super steep edge of a single-edge and multi-edges submicron grating with nano-scale, and its phase distribution is captured. Model simulation is performed to confirm the phase-shifting phenomenon of the edge. A phase-shifting detection algorithm is developed to spatially detect the edge when a finite step scanning with a pitch of several tenth nanometers is used. A 180 nm deviation can occur during detection when the step height of the detecting edge varies, or the detecting laser spot covers more than one edge. Preliminary experimental results show that for the edge detection of the submicron line width of the grating, the standard deviation of the optical phase difference detection measurement is 38 nm. This technique provides a feasible means to achieve optical super-resolution on micro-grating measurement.

  5. Surfactant-assisted solvothermal synthesis of pure nickel submicron spheres with microwave-absorbing properties

    Science.gov (United States)

    Guo, Heng; Pu, Bingxue; Chen, Haiyuan; Yang, Jin; Zhou, Yajun; Yang, Jian; Bismark, Boateng; Li, Handong; Niu, Xiaobin

    2016-07-01

    Pure metallic nickel submicron spheres (Ni-SSs), flower-like nickel nanoflakes, and hollow micrometer-sized nickel spheres/tubes were controllably synthesized by a facile and efficient one-step solvothermal method with no reducing agent. The characteristics of these nickel nanostructures include morphology, structure, and purification. Possible synthesis mechanisms were discussed in detail. The resultant Ni-SSs had a wide diameter distribution of 200~800 nm through the aggregation of small nickel nanocrystals. The ferromagnetic behaviors of Ni-SSs investigated at room temperature showed high coercivity values. Furthermore, the microwave absorption properties of magnetic Ni-SSs were studied in the frequency range of 0.5-18.0 GHz. The minimum reflection loss reached -17.9 dB at 17.8 GHz with a thin absorption thickness of 1.2 mm, suggesting that the submicron spherical structures could exhibit excellent microwave absorption properties. More importantly, this one-pot synthesize route provides a universal and convenient way for preparation of larger scale pure Ni-SSs, showing excellent microwave absorption properties.

  6. Optimizing a manufacturing submicron CMOS process for low-voltage applications

    Science.gov (United States)

    Ma, Jun; Cheng, Sunny; Pryor, Bob; Klein, Kevin

    1996-09-01

    A low threshold voltage (Vt) is desired to improve a CMOS circuit performance when operating at reduced supply voltages to save power. In this paper, a practical approach to reduce Vt for a conventional, manufacturing submicron CMOS process is presented. This `evolutionary' approach to reduce Vt is taken so as the ensure manufacturability and to reduce process cost. This is found to be useful especially before a deep-submicron or a sophisticated process targeted for low voltage application becomes available and manufacturable. Vt reduction is achieved by the integration of a thinner, in the case presented here a 105 angstroms, gate oxide into a 0.65 micrometers process. The process is then optimized to provide the device with highest current-drive while obtaining lowest Vt with acceptable subthreshold leakage with conventional front-end and back-end process. It is shown that, with the minimal changes to the 0.65 micrometers conventional manufacturing process, the Vt's for nominal n- and p-channel devices can be reduced by 20% - 30%, with more than 1.5X improvement in current drive at 3.3 V compared to devices with 150 angstroms gate oxide. The enhancement of circuit performance is demonstrated with measurements of benchmark circuits including CPU, ROM, and FSRAM, where successful operation has been obtained near IV and operating frequencies are nearly doubled at supply voltage near 1.6 V compared to conventional 0.65 micrometers process.

  7. Single-Mode Lasers Based on Cesium Lead Halide Perovskite Submicron Spheres.

    Science.gov (United States)

    Tang, Bing; Dong, Hongxing; Sun, Liaoxin; Zheng, Weihao; Wang, Qi; Sun, Fangfang; Jiang, Xiongwei; Pan, Anlian; Zhang, Long

    2017-11-28

    Single-mode laser is realized in a cesium lead halide perovskite submicron sphere at room temperature. All-inorganic cesium lead halide (CsPbX 3 , X = Cl, Br, I) microspheres with tunable sizes (0.2-10 μm) are first fabricated by a dual-source chemical vapor deposition method. Due to smooth surface and regular geometry structure of microspheres, whispering gallery resonant modes make a single-mode laser realized in a submicron sphere. Surprisingly, a single-mode laser with a very narrow line width (∼0.09 nm) was achieved successfully in the CsPbX 3 spherical cavity at low threshold (∼0.42 μJ cm -2 ) with a high cavity quality factor (∼6100), which are the best specifications of lasing modes in all natural nano/microcavities ever reported. By modulating the halide composition and sizes of the microspheres, the wavelength of a single-mode laser can be continuously tuned from red to violet (425-715 nm). This work illustrates that the well-controlled synthesis of metal cesium lead halide perovskite nano/microspheres may offer an alternative route to produce a widely tunable and greatly miniaturized single-mode laser.

  8. Development of eco-friendly submicron emulsions stabilized by a bio-derived gum.

    Science.gov (United States)

    Pérez-Mosqueda, Luis María; Ramírez, Pablo; Trujillo-Cayado, Luis Alfonso; Santos, Jenifer; Muñoz, José

    2014-11-01

    Many traditional organic solvents are being gradually replaced by ecofriendly alternatives. D-Limonene is a terpenic (bio)-solvent that fulfils the requirements to be considered a green solvent. D-Limonene sub-micron emulsions suffer from Ostwald ripening destabilization. In this study, we examined the influence of the addition of a natural gum (rosin gum) to D-limonene in order to prevent Ostwald ripening. This contribution deals with the study of emulsions formulated with a mixture of D-limonene and rosin gum as dispersed phase and Pluronic PE9400 as emulsifier. The procedure followed for the development of these formulations was based on the application of product design principles. This led to the optimum ratio rosin gum/D-limonene and subsequently to the optimum surfactant concentration. The combination of different techniques (rheology, laser diffraction and multiple light scattering) was demonstrated to be a powerful tool to assist in the prediction of the emulsions destabilization process. Not only did the addition of rosin gum highly increase the stability of these emulsions by inhibiting the Ostwald ripening, but it also reduced the emulsions droplet size. Thus, we found that stable sub-micron D-limonene-in-water emulsions have been obtained in the range 3-6 wt% Pluronic PE-9400 by means of a single-step rotor/stator homogenizing process. Copyright © 2014 Elsevier B.V. All rights reserved.

  9. Electron beam inspection of 16nm HP node EUV masks

    Science.gov (United States)

    Shimomura, Takeya; Narukawa, Shogo; Abe, Tsukasa; Takikawa, Tadahiko; Hayashi, Naoya; Wang, Fei; Ma, Long; Lin, Chia-Wen; Zhao, Yan; Kuan, Chiyan; Jau, Jack

    2012-11-01

    EUV lithography (EUVL) is the most promising solution for 16nm HP node semiconductor device manufacturing and beyond. The fabrication of defect free EUV mask is one of the most challenging roadblocks to insert EUVL into high volume manufacturing (HVM). To fabricate and assure the defect free EUV masks, electron beam inspection (EBI) tool will be likely the necessary tool since optical mask inspection systems using 193nm and 199nm light are reaching a practical resolution limit around 16nm HP node EUV mask. For production use of EBI, several challenges and potential issues are expected. Firstly, required defect detection sensitivity is quite high. According to ITRS roadmap updated in 2011, the smallest defect size needed to detect is about 18nm for 15nm NAND Flash HP node EUV mask. Secondly, small pixel size is likely required to obtain the high sensitivity. Thus, it might damage Ru capped Mo/Si multilayer due to accumulated high density electron beam bombardments. It also has potential of elevation of nuisance defects and reduction of throughput. These challenges must be solved before inserting EBI system into EUV mask HVM line. In this paper, we share our initial inspection results for 16nm HP node EUV mask (64nm HP absorber pattern on the EUV mask) using an EBI system eXplore® 5400 developed by Hermes Microvision, Inc. (HMI). In particularly, defect detection sensitivity, inspectability and damage to EUV mask were assessed. As conclusions, we found that the EBI system has capability to capture 16nm defects on 64nm absorber pattern EUV mask, satisfying the sensitivity requirement of 15nm NAND Flash HP node EUV mask. Furthermore, we confirmed there is no significant damage to susceptible Ru capped Mo/Si multilayer. We also identified that low throughput and high nuisance defect rate are critical challenges needed to address for the 16nm HP node EUV mask inspection. The high nuisance defect rate could be generated by poor LWR and stitching errors during EB writing

  10. Improvement of unified mask data formats for EB writers

    Science.gov (United States)

    Suzuki, Toshio; Hirumi, Junji; Yoshioka, Nobuyuki; Hojyo, Yutaka; Kawase, Yuichi; Hara, Shigehiro; Kuriyama, Koki; Hoga, Morihisa; Watanabe, Satoshi W.; Kawase, Hidemichi; Kamimoto, Tomoko; Kato, Kokoro

    2004-08-01

    Mask data preparation (MDP) is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have developed unified mask data formats for Variable-Shaped-Beam (VSB) EB writers with efficient data compaction. The unified mask data formats are composed of a pattern data format for EB writers named "NEO" and a layout format named "MALY". We released NEO and MALY on April 2003. To evaluate NEO and MALY, we have made a prototype system of MDP such as a converter from design data to NEO/MALY and converters from NEO/MALY to each EB data. We have evaluated about functions and performance of the MDP flow using real design data in device manufacturers. As a result, some improvements in NEO and MALY were achieved and we have revised the specification of NEO and MALY as the final version. We have confirmed that NEO and MALY can be used for a set of unified mask data formats among VSB EB writers and can reduce complexity of mask data handling in mask manufacturers. They will be put to practical use in MDP flow.

  11. Airflow-Restricting Mask Reduces Acute Performance in Resistance Exercise

    Directory of Open Access Journals (Sweden)

    Yuri L. Motoyama

    2016-09-01

    Full Text Available Background: The aim of this study was to compare the number of repetitions to volitional failure, the blood lactate concentration, and the perceived exertion to resistance training with and without an airflow-restricting mask. Methods: Eight participants participated in a randomized, counterbalanced, crossover study. Participants were assigned to an airflow-restricting mask group (MASK or a control group (CONT and completed five sets of chest presses and parallel squats until failure at 75% one-repetition-maximum test (1RM with 60 s of rest between sets. Ratings of perceived exertion (RPEs, blood lactate concentrations (Lac−, and total repetitions were taken after the training session. Results: MASK total repetitions were lower than those of the CONT, and (Lac− and MASK RPEs were higher than those of the CONT in both exercises. Conclusions: We conclude that an airflow-restricting mask in combination with resistance training increase perceptions of exertion and decrease muscular performance and lactate concentrations when compared to resistance training without this accessory. This evidence shows that the airflow-restricting mask may change the central nervous system and stop the exercise beforehand to prevent some biological damage.

  12. Electrochemical Micromachining with Fiber Laser Masking for 304 Stainless Steel

    Science.gov (United States)

    Li, Xiaohai; Wang, Shuming; Wang, Dong; Tong, Han

    2017-10-01

    In order to fabricate micro structure, the combined machining of electrochemical micro machining (EMM) and laser masking for 304 stainless steel was studied. A device of composite machining of EMM with laser masking was developed, and the experiments of EMM with laser masking were carried out. First, by marking pattern with fiber laser on the surface of 304 stainless steel, the special masking layer can be formed. Through X ray photoelectron spectroscopy (XPS), the corrosion resistance of laser masking layer was analyzed. It is proved by XPS that the iron oxide and chromium oxide on the surface of stainless steel generates due to air oxidation when laser scanning heats. Second, the localization and precision of EMM are improved, since the marking patterns forming on the surface of stainless steel by laser masking play a protective role in the process of subsequent EMM when the appropriate parameters of EMM are selected. At last, the shape and the roughness of the machined samples were measured by SEM and optical profilometer and analyzed. The results show that the rapid fabrication of micro structures on the 304 stainless steel surface can be achieved by EMM with fiber laser masking, which has a good prospect in the field of micro machining.

  13. New method of contour-based mask-shape compiler

    Science.gov (United States)

    Matsuoka, Ryoichi; Sugiyama, Akiyuki; Onizawa, Akira; Sato, Hidetoshi; Toyoda, Yasutaka

    2007-10-01

    We have developed a new method of accurately profiling a mask shape by utilizing a Mask CD-SEM. The method is intended to realize high accuracy, stability and reproducibility of the Mask CD-SEM adopting an edge detection algorithm as the key technology used in CD-SEM for high accuracy CD measurement. In comparison with a conventional image processing method for contour profiling, it is possible to create the profiles with much higher accuracy which is comparable with CD-SEM for semiconductor device CD measurement. In this report, we will introduce the algorithm in general, the experimental results and the application in practice. As shrinkage of design rule for semiconductor device has further advanced, an aggressive OPC (Optical Proximity Correction) is indispensable in RET (Resolution Enhancement Technology). From the view point of DFM (Design for Manufacturability), a dramatic increase of data processing cost for advanced MDP (Mask Data Preparation) for instance and surge of mask making cost have become a big concern to the device manufacturers. In a sense, it is a trade-off between the high accuracy RET and the mask production cost, while it gives a significant impact on the semiconductor market centered around the mask business. To cope with the problem, we propose the best method for a DFM solution in which two dimensional data are extracted for an error free practical simulation by precise reproduction of a real mask shape in addition to the mask data simulation. The flow centering around the design data is fully automated and provides an environment where optimization and verification for fully automated model calibration with much less error is available. It also allows complete consolidation of input and output functions with an EDA system by constructing a design data oriented system structure. This method therefore is regarded as a strategic DFM approach in the semiconductor metrology.

  14. Rheumatic masks of plasma cell dyscrasias

    Directory of Open Access Journals (Sweden)

    Vladimir Ivanovich Vasilyev

    2012-01-01

    Full Text Available Objective: to consider clinical practice problems in the differential diagnosis of different types of plasma cell dyscrasias (PCD. Subjects and methods. Fourteen patients (8 men and 6 women aged 52±12 years, in whom rheumatic diseases (RD were ruled out and who were diagnosed as having primary PCD: different types of myeloma in 7 patients, myeloma + AL-amyloidosis in 2, AL-amyloidosis in 3, and Waldenstrom’s macroglobulinemia in 2, were examined. Results and discussion. The most common maldiagnosed RDs in patients with PCD were seronegative rheumatoid arthritis (RA, systemic lupus erythematosus, Sjogren’s disease, and different forms of vasculitis. The most frequent masks of RD were kidney (78% and osteoarticular system (64% lesions, vascular disorders (36%, peripheral polyneuropathies (36%, and enlarged salivary glands with xerostomia (28.5%. Serum and urine immunochemical study should be performed in all patients who have clinical manifestations of seropositive RA, spondyloarthritis, intensive bone pain syndrome, ulceronecrotic vasculitis, enlarged submandibular salivary glands with macroglossia in the absence of markers of autoimmune disease for the timely diagnosis of PCD and the exclusion of RD. The paper estimates the sensitivity and specificity of main methods used to diagnose different types of PCD.

  15. Optimized furosemide taste masked orally disintegrating tablets

    Directory of Open Access Journals (Sweden)

    Mohamed Abbas Ibrahim

    2017-11-01

    Full Text Available Optimized orally disintegrating tablets (ODTs containing furosemide (FUR were prepared by direct compression method. Two factors, three levels (32 full factorial design was used to optimize the effect of taste masking agent (Eudragit E100; X1 and superdisintegarant; croscarmellose sodium (CCS; X2 on tablet properties. A composite was prepared by mixing ethanolic solution of FUR and Eudragit E100 with mannitol prior to mixing with other tablet ingredients. The prepared ODTs were characterized for their FUR content, hardness, friability and wetting time. The optimized ODT formulation (F1 was evaluated in term of palatability parameters and the in vivo disintegration. The manufactured ODTs were complying with the pharmacopeia guidelines regarding hardness, friability, weight variation and content. Eudragit E100 had a very slightly enhancing effect on tablets disintegration. However, the effects of both Eudragit E100 (X1 and CCS (X2 on ODTs disintegration time (Y1 were insignificant (p > 0.05. Moreover, X1 exhibited antagonistic effect on the dissolution after 5 and 30 min (D5 and D30, respectively, but only its effect on D30 is significant (p = 0.0004. Furthermore, the optimized ODTs formula showed good to acceptable taste in term of palatability, and in vivo disintegration time of this formula was about 10 s.

  16. Optimized furosemide taste masked orally disintegrating tablets.

    Science.gov (United States)

    Ibrahim, Mohamed Abbas; Abou El Ela, Amal El Sayeh F

    2017-11-01

    Optimized orally disintegrating tablets (ODTs) containing furosemide (FUR) were prepared by direct compression method. Two factors, three levels (3 2 ) full factorial design was used to optimize the effect of taste masking agent (Eudragit E100; X1) and superdisintegarant; croscarmellose sodium (CCS; X2) on tablet properties. A composite was prepared by mixing ethanolic solution of FUR and Eudragit E100 with mannitol prior to mixing with other tablet ingredients. The prepared ODTs were characterized for their FUR content, hardness, friability and wetting time. The optimized ODT formulation (F1) was evaluated in term of palatability parameters and the in vivo disintegration. The manufactured ODTs were complying with the pharmacopeia guidelines regarding hardness, friability, weight variation and content. Eudragit E100 had a very slightly enhancing effect on tablets disintegration. However, the effects of both Eudragit E100 (X1) and CCS (X2) on ODTs disintegration time (Y1) were insignificant (p > 0.05). Moreover, X1 exhibited antagonistic effect on the dissolution after 5 and 30 min (D5 and D30, respectively), but only its effect on D30 is significant (p = 0.0004). Furthermore, the optimized ODTs formula showed good to acceptable taste in term of palatability, and in vivo disintegration time of this formula was about 10 s.

  17. A behavioral database for masked form priming.

    Science.gov (United States)

    Adelman, James S; Johnson, Rebecca L; McCormick, Samantha F; McKague, Meredith; Kinoshita, Sachiko; Bowers, Jeffrey S; Perry, Jason R; Lupker, Stephen J; Forster, Kenneth I; Cortese, Michael J; Scaltritti, Michele; Aschenbrenner, Andrew J; Coane, Jennifer H; White, Laurence; Yap, Melvin J; Davis, Chris; Kim, Jeesun; Davis, Colin J

    2014-12-01

    Reading involves a process of matching an orthographic input with stored representations in lexical memory. The masked priming paradigm has become a standard tool for investigating this process. Use of existing results from this paradigm can be limited by the precision of the data and the need for cross-experiment comparisons that lack normal experimental controls. Here, we present a single, large, high-precision, multicondition experiment to address these problems. Over 1,000 participants from 14 sites responded to 840 trials involving 28 different types of orthographically related primes (e.g., castfe-CASTLE) in a lexical decision task, as well as completing measures of spelling and vocabulary. The data were indeed highly sensitive to differences between conditions: After correction for multiple comparisons, prime type condition differences of 2.90 ms and above reached significance at the 5% level. This article presents the method of data collection and preliminary findings from these data, which included replications of the most widely agreed-upon differences between prime types, further evidence for systematic individual differences in susceptibility to priming, and new evidence regarding lexical properties associated with a target word's susceptibility to priming. These analyses will form a basis for the use of these data in quantitative model fitting and evaluation and for future exploration of these data that will inform and motivate new experiments.

  18. Post masking with two maskers: effects of bandwidth.

    Science.gov (United States)

    Fastl, M; Bechly, M

    1981-06-01

    Thresholds of test tone impulses masked by one masker M1 or two maskers M1 + M2 are determined in a post-masking (forward masking) stimulus paradigm. Test tones are centered at masker M1 and the bandwidth of M1 is varied. The magnitude of the threshold decrease delta L caused by the addition of masker M2 depends on masker M2 as follows: Large delta L for narrow-band noise and AM tone, medium delta L for pure- and QFM-tone, almost no threshold decrease for broadband noise-masker M1.

  19. Integration of mask and silicon metrology in DFM

    Science.gov (United States)

    Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

    2009-03-01

    We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based

  20. [Comparison of efficacy for laryngeal mask airway-Supreme(TM) versus common laryngeal mask airway in children].

    Science.gov (United States)

    Shangguan, Wang-ning; You, Shan; He, Wei; DI, Mei-qin; Xu, Jian; Li, Jun; Lian, Qing-quan

    2013-11-19

    To compare the efficacy of laryngeal mask airway-Supreme(TM) versus common laryngeal mask airway in children with general anesthesia. With local research ethics committee's approval and written informed parental consent, 100 children were randomly divided into groups L (size 2.0 common laryngeal mask airway) and S (size 2.0 laryngeal mask airway-Supreme(TM)) according to random number (n = 50 each). After anesthesia induction, a common laryngeal mask airway or laryngeal mask airway-Supreme(TM) was inserted and mechanically ventilated. Time and ease for insertion, insertion success rate, airway leak pressure, success rate and ease of disposal sputum collecting tube insertion in group S, quality of airway during anesthetic maintenance, abdominal circumference changes and complications within 24 h post-operation were measured. Compared with group L, abdominal circumference increased less in group S (0.90 ± 0.35 vs 0.43 ± 0.18 cm, n = 46, P children with mechanical ventilation, laryngeal mask airway-Supreme(TM) can be effectively applied to maintain a good airway. And the incidence of gastric insufflation is lower. It is particularly useful for those requiring evacuation of gastric contents during general anesthesia.

  1. Ventilator-delivered mask ventilation compared with three standard methods of mask ventilation in a manikin model.

    Science.gov (United States)

    Tracy, M B; Klimek, J; Coughtrey, H; Shingde, V; Ponnampalam, G; Hinder, M; Maheshwari, R; Tracy, S K

    2011-05-01

    Little is known regarding the variations in effective ventilation during bag and mask resuscitation with standard methods compared with that delivered by ventilator-delivered mask ventilation (VDMV). To measure the variations in delivered airway pressure, tidal volume (TV), minute ventilation (MV) and inspiratory time during a 3-min period of mask ventilation comparing VDMV with three commonly used hand-delivered methods of bag and mask ventilation: Laerdal self-inflating bag (SIB); anaesthetic bag and T-piece Neopuff. A modified resuscitation manikin was used to measure variation in mechanical ventilation during 3-min periods of mask ventilation. Thirty-six experienced practitioners gave positive pressure mask ventilation targeting acceptable chest wall movement with a rate of 60 inflations/min and when pressures could be targeted or set, a peak inspiratory pressure (PIP) of 18 cm water, positive end-expiratory pressure (PEEP) of 5 cm water, for 3 min with each of the four mask ventilation methods. Each mode was randomly sequenced. A total of 21 136 inflations were recorded and analysed. VDMV achieved PIP and PEEP closest to that targeted and significantly lower variation in all measured parameters (pventilation on a manikin, VDMV produced the least variation in delivered ventilation. SIB produced wide variation and unacceptably high TV and MV in experienced hands.

  2. The role of jet and film drops in controlling the mixing state of submicron sea spray aerosol particles

    Energy Technology Data Exchange (ETDEWEB)

    Wang, Xiaofei; Deane, Grant B.; Moore, Kathryn A.; Ryder, Olivia S.; Stokes, M. Dale; Beall, Charlotte M.; Collins, Douglas B.; Santander, Mitchell V.; Burrows, Susannah M.; Sultana, Camille M.; Prather, Kimberly A.

    2017-06-19

    Covering 71% of the Earth’s surface, oceans represent a significant global source of atmospheric aerosols. The size and composition of sea spray aerosols (SSA) affect their ability to serve as cloud seeds and thus understanding the factors controlling their composition is critical to predicting their impact on clouds and climate. SSA particles have been shown to be an external mixture of particles with different compositions. Film and jet drop production mechanisms ultimately determine the individual particle compositions which are comprised of an array of salt/organic mixtures ranging from pure sea salt to nearly pure organic particles. It is often assumed that the majority of submicron SSA are formed by film drops produced from bursting hydrophobic organic-rich bubble film caps at the sea surface, and in contrast, jet drops are postulated to produce larger supermicron particles from underlying seawater comprised largely of salts and water soluble organic species. However, here we show that jet drops produced by bursting sub-100 m bubbles account for up to 40 % of all submicron particles. They have distinct chemical compositions, organic volume fractions and ice nucleating activities from submicron film drops. Thus a substantial fraction of submicron particles will not necessarily be controlled by the composition of the sea surface microlayer as has been assumed in many studies. This finding has significant ramifications for the size-resolved mixing states of SSA particles which must be taken into consideration when accessing SSA impacts on clouds.

  3. A Nordic project on high speed low power design in sub-micron CMOS technology for mobile phones

    DEFF Research Database (Denmark)

    Olesen, Ole

    This paper is a survey paper presenting the Nordic CONFRONT project and reporting some results from the group at CIE/DTU, Denmark. The objective of the project is to demonstrate the feasibility of sub-micron CMOS for the realisation of RF front-end circuits operating at frequencies in the 1...

  4. Submicron InP DHBT technology for high-speed high-swing mixed-signal ICs

    DEFF Research Database (Denmark)

    Godin, Jean; Nodjiadjim, V.; Riet, Muriel

    2008-01-01

    We report on the development of a submicron InP DHBT technology, optimized for the fabrication of 50-GHz-clock mixed signal ICs. In-depth study of device geometry and structure has allowed to get the needed performances and yield. Special attention has been paid to critical thermal behavior. Vari...

  5. In situ quantitative measurement of concentration profiles in a microreactor with submicron resolution using multiplex CARS microscopy

    NARCIS (Netherlands)

    Schafer, D.; Squier, J.A.; van Maarseveen, J.; Bonn, D.; Bonn, M.; Müller, M.

    2008-01-01

    In situ quantitative imaging of concentration profiles of reactants and products inside a microfluidic reactor is achieved, with submicron spatial resolution with similar to mM sensitivity and on similar to ms time scales, for a given position. The label-free approach relies on quantitative

  6. A closer look at four-dot masking of a foveated target

    Directory of Open Access Journals (Sweden)

    Marwan Daar

    2016-06-01

    Full Text Available Four-dot masking with a common onset mask was recently demonstrated in a fully attended and foveated target (Filmer, Mattingley & Dux, 2015. Here, we replicate and extend this finding by directly comparing a four-dot mask with an annulus mask while probing masking as a function of mask duration, and target-mask separation. Our results suggest that while an annulus mask operates via spatially local contour interactions, a four-dot mask operates through spatially global mechanisms. We also measure how the visual system’s representation of an oriented bar is impacted by a four-dot mask, and find that masking here does not degrade the precision of perceived targets, but instead appears to be driven exclusively by rendering the target completely invisible.

  7. The time-course of visual masking effects on saccadic responses indicates that masking interferes with reentrant processing

    DEFF Research Database (Denmark)

    Crouzet, S.; Pin, Simon Hviid Del; Overgaard, Morten

    2013-01-01

    with reentrant processing, then the first feedforward sweep should be left relatively intact. Using a standard OSM paradigm in combination with a saccadic choice task, giving access to an early phase of visual processing (the fastest saccades occurring only 100 ms after target onset), we compared the masking...... time-course of OSM, noise backward masking, as well as a simple target contrast decrease. Consistently with a reentrant account, a significantly stronger masking effect was observed for slow (larger than median RT; average median RT = 177 ms) relatively to fast saccades in the OSM condition...

  8. The minimum thickness of a multilayer porcelain restoration required for masking severe tooth discoloration

    Directory of Open Access Journals (Sweden)

    Niloofar Shadman

    2015-01-01

    Full Text Available Background: Although studies have shown that porcelain veneers are very efficient for treating discolored teeth, they did not address in particular the minimum thickness of a multilayer IPS e.max Press (IvoclarVivadent, Schaan, Liechtenstein restoration required to mask discolored tooth. The aim of this study was to determine the minimum thickness of a multilayer porcelain restoration required for masking severe tooth discoloration. Materials and Methods: A total of 24 disk-shaped multilayer specimens were prepared from IPS e.max Press with the diameter of 13 mm and four different thicknesses (core/veneer: 0.4/0.4 mm, 0.5/0.5 mm, 0.6/0.6 mm and 0.8/0.7 mm. Two backgrounds, C4-shade body porcelain and an opaque background from the selected IPS e.max ceramic itself were fabricated to mimic a discolored or stained natural tooth structure and to determine the masking ability. After applying the resin cement layer (Panavia F2.0 with 0.01 mm thickness on each background, all specimens were measured on both background using a spectrophotometer and values of LFNx01, aFNx01 and bFNx01 were calculated to determine the color differences (ΔEFNx01ab. One-way ANOVA and post-hoc tests of specimen average one-to-one comparison (Tukey HSD were conducted and P ≤ 0.05 was set as the level of significance. Results: ΔEFNx01ab of all groups were within the range of the clinically acceptable color difference (ΔE ≤3.3, thus all the groups could mask the C4 background even group 1 with only 0.8 mm thickness. A trend was shown in the results as by increasing the thickness, ΔEFNx01ab is was decreased. The mean ΔE FNx011FNx01aFNx01b between different thicknesses were statistically significant (P < 0.05 only between group 4 with groups 1 and 2, respectively. Conclusion: Within the limitations of this study, all studied thicknesses could mask the C4 background. However, the minimum thickness of a multilayer porcelain restoration (IPS e.max Press required for masking

  9. Backward Masked Snakes and Guns Modulate Spatial Attention

    Directory of Open Access Journals (Sweden)

    Joshua M. Carlson

    2009-10-01

    Full Text Available Fearful faces are important social cues that alert others of potential threat. Even backward masked fearful faces facilitate spatial attention. However, visual stimuli other than fearful faces can signal potential threat. Indeed, unmasked snakes and spiders modulate spatial attention. Yet, it is unclear if the rapid threat-related facilitation of spatial attention to backward masked stimuli is elicited by non-face threat cues. Evolutionary theories claim that phylogenetic threats (i.e. snakes and spiders should preferentially elicit an automatic fear response, but it is untested as to whether this response extends to enhancements in spatial attention under restricted processing conditions. Thirty individuals completed a backward masking dot-probe task with both evolutionary relevant and irrelevant threat cues. The results suggest that backward masked visual fear stimuli modulate spatial attention. Both evolutionary relevant (snake and irrelevant (gun threat cues facilitated spatial attention.

  10. Comparison of three methods in improving bag mask ventilation

    Directory of Open Access Journals (Sweden)

    Samad EJ Golzari

    2014-01-01

    Conclusions: Leaving dentures in place in edentulous patients after inducing anesthesia improves bag-mask ventilation. However, placing folded compressed gauze in buccal space leads to more significant improvement in BMV compared to leaving dentures in place.

  11. Ion projection lithography: progress in mask and tool technology

    Science.gov (United States)

    Ehrmann, Albrecht; Kaesmaier, Rainer; Struck, Thomas

    2000-02-01

    Ion Projection Lithography is one of the major competitors for sub 100 nm-lithography. Within the MEDEA ion projection lithography project and other activities related to it, new results in mask and tool technology have been obtained. The exposure tool is in process of being assembled, so that information of the components as the multi-cusp ion source can be given. Results from the field-composable lens electrode manufacturing and of the off-axis alignment system are to be presented. Mask process technology has been improved by introduction of a multi-step trench etch technique. A stencil mask based on a 200 mm wafer has been produced. In addition, the repeatability values of placement and CD measurements have been decreased. Defect inspection with optical KLA tool results give information on the current limits for stencil mask applications.

  12. MISR radiometric camera-by-camera Cloud Mask V004

    Data.gov (United States)

    National Aeronautics and Space Administration — This file contains the Radiometric camera-by-camera Cloud Mask dataset. It is used to determine whether a scene is classified as clear or cloudy. A new parameter has...

  13. Kuldne Mask Tallinnasssssss! / Sergei Zhenovatsh ; interv. Hellar Bergmann

    Index Scriptorium Estoniae

    Zhenovatsh, Sergei

    2008-01-01

    Lavastaja Sergei Zhenovatsh oma Teatrikunsti Stuudiost, noortest näitlejatest, Eestist. Lavastaja on Eestis teatrifestivali "Kuldne mask Eestis" raames. 10.-11. okt. etendus Tallinnas, Salme Kultuurikeskuses Nikolai Gogoli näidend "Mängurid"

  14. The effect of masking in the attentional dwell time paradigm

    DEFF Research Database (Denmark)

    Petersen, Anders

    2009-01-01

    A temporary functional blindness to the second of two spatially separated targets has been identified in numerous studies of temporal visual attention. This effect is known as attentional dwell time and is maximal 200 to 500 ms after presentation of the first target (e.g. Duncan, Ward, Shapiro......, 1994). In most studies of attentional dwell time, two masked targets have been used. Moore et al. (1996) have criticised the masking of the first target when measuring the attentional dwell time, finding a shorter attentional dwell time when the first mask was omitted. In the presented work, the effect...... an impairment of the second target. Hence, the attentional dwell time may be a combined effect arising from attending to both the first target and its mask....

  15. Blind binary masking for reverberation suppression in cochlear implants.

    Science.gov (United States)

    Hazrati, Oldooz; Lee, Jaewook; Loizou, Philipos C

    2013-03-01

    A monaural binary time-frequency (T-F) masking technique is proposed for suppressing reverberation. The mask is estimated for each T-F unit by extracting a variance-based feature from the reverberant signal and comparing it against an adaptive threshold. Performance of the estimated binary mask is evaluated in three moderate to relatively high reverberant conditions (T60 = 0.3, 0.6, and 0.8 s) using intelligibility listening tests with cochlear implant users. Results indicate that the proposed T-F masking technique yields significant improvements in intelligibility of reverberant speech even in relatively high reverberant conditions (T60 = 0.8 s). The improvement is hypothesized to result from the recovery of the vowel/consonant boundaries, which are severely smeared in reverberation.

  16. Thermal stress analysis of the SLAC fixed mask. Addendum

    Energy Technology Data Exchange (ETDEWEB)

    Johnson, G.L.; Pierce, R.E.

    1985-07-25

    X-ray beams emerging from the new SLAC electron-positron storage ring (PEP) can impinge on the walls of tangential divertor channels. A fixed mask made of OFHC copper is installed in the channel to limit wall heating. The mask is cooled with water flowing axially at 30/sup 0/C. Beam strikes on the mask cause highly localized heating in the channel structure. Analyses were completed to determine the temperatures and thermally-induced stresses due to this heating. The current design and operating conditions should result in the entrance to the fixed mask operating at a peak temperature of 105/sup 0/C with a peak thermal stress at 26% of yield.

  17. Error response test system and method using test mask variable

    Science.gov (United States)

    Gender, Thomas K. (Inventor)

    2006-01-01

    An error response test system and method with increased functionality and improved performance is provided. The error response test system provides the ability to inject errors into the application under test to test the error response of the application under test in an automated and efficient manner. The error response system injects errors into the application through a test mask variable. The test mask variable is added to the application under test. During normal operation, the test mask variable is set to allow the application under test to operate normally. During testing, the error response test system can change the test mask variable to introduce an error into the application under test. The error response system can then monitor the application under test to determine whether the application has the correct response to the error.

  18. Hierarchical mask creation for intelligent image coding using saliency maps

    Directory of Open Access Journals (Sweden)

    Radoslav Vargic

    2016-12-01

    Full Text Available In this paper we analyze basic mask creation methods for intelligent image coding using saliency maps. For saliency maps based image coding we use specific extension of SPIHT algorithm called SM SPIHT related to region of interest encoding but extending this approach further, ending with individual weight of importance for each pixel in image using the form of saliency map. This approach is proved to be effective. In this article we analyze impact of different basic hierarchical mask creation methods, which have impact on error separation between salient and not salient parts of the image. The results indicate that proposed mask creation method outperforms JPEG2000 based mask tree creation method.

  19. A Precise-Mask-Based Method for Enhanced Image Inpainting

    Directory of Open Access Journals (Sweden)

    Wanxu Zhang

    2016-01-01

    Full Text Available Mask of damage region is the pretreatment step of the image inpainting, which plays a key role in the ultimate effect. However, state-of-the-art methods have attached significance to the inpainting model, and the mask of damage region is usually selected manually or by the conventional threshold-based method. Since manual method is time-consuming and the threshold-based method does not have the same precision for different images, we herein report a new method for automatically constructing the precise mask by the joint filtering of guided filtering and L0 smoothing. It can accurately locate the boundary of damaged region in order to effectively segment the damage region and then greatly improves the ultimate effect of image inpainting. The experimental results show that the proposed method is superior to state-of-the-art methods in the step of constructing inpainting mask, especially for the damaged region with inconspicuous boundary.

  20. Organic solar cells with submicron-thick polymer:fullerene bulk heterojunction films

    Science.gov (United States)

    Lee, Seungsoo; Nam, Sungho; Kim, Hwajeong; Kim, Youngkyoo

    2010-09-01

    We report the viability of organic solar cells with submicron-thick bulk heterojunction films, which were fabricated by mixing poly(3-hexylthiophene) and [6,6]-phenyl-C61-butyric acid methyl ester at a solid concentration of 90 mg/ml. To elucidate the physics behind the thick film solar cells, optical transmittance and electrical characteristics were compared for film thicknesses between 520 and 1000 nm. Results showed that the device (520 nm thick film; efficiency=3.68%) exhibited similar performance to that of a control device (170 nm thick). A decreasing device performance was measured for much thicker films (efficiency=0.34% for the 1000 nm thick device).

  1. Stochastic process variation in deep-submicron CMOS circuits and algorithms

    CERN Document Server

    Zjajo, Amir

    2014-01-01

    One of the most notable features of nanometer scale CMOS technology is the increasing magnitude of variability of the key device parameters affecting performance of integrated circuits. The growth of variability can be attributed to multiple factors, including the difficulty of manufacturing control, the emergence of new systematic variation-generating mechanisms, and most importantly, the increase in atomic-scale randomness, where device operation must be described as a stochastic process. In addition to wide-sense stationary stochastic device variability and temperature variation, existence of non-stationary stochastic electrical noise associated with fundamental processes in integrated-circuit devices represents an elementary limit on the performance of electronic circuits. In an attempt to address these issues, Stochastic Process Variation in Deep-Submicron CMOS: Circuits and Algorithms offers unique combination of mathematical treatment of random process variation, electrical noise and temperature and ne...

  2. High Proportions of Sub-micron Particulate Matter in Icelandic Dust Storms in 2015

    Science.gov (United States)

    Dagsson Waldhauserova, Pavla; Arnalds, Olafur; Olafsson, Haraldur; Magnusdottir, Agnes

    2017-04-01

    Iceland is extremely active dust region and desert areas of over 44,000 km2 acknowledge Iceland as the largest Arctic and European desert. Frequent dust events, up to 135 dust days annually, transport dust particles far distances towards the Arctic and Europe. Satellite MODIS pictures have revealed dust plumes exceeding 1,000 km. The annual dust deposition was calculated as 40.1 million tons yr-1. Two dust storms were measured in transverse horizontal profile about 90 km far from different dust sources in southwestern Iceland in the summer of 2015. Aerosol monitor DustTrak DRX 8533EP was used to measure PM mass concentrations corresponding to PM1, PM2.5, PM4, PM10 and the total PM15 at several places within the dust plume. Images from camera network operated by the Icelandic Road and Coastal Administration were used to estimate the visibility and spatial extent of measured dust events. A numerical simulation of surface winds was carried out with the numerical model HIRLAM with horizontal resolution of 5 km and used to calculate the total dust flux from the sources. The in situ measurements inside the dust plumes showed that aeolian dust can be very fine. The study highlights that suspended volcanic dust in Iceland causes air pollution with extremely high PM1 concentrations comparable to the polluted urban stations in Europe or Asia rather than reported dust event observations from around the world. The PM1/PM2.5 ratios are generally low during dust storms outside of Iceland, much lower than > 0.9 and PM1/PM10 ratios of 0.34-0.63 found in our study. It shows that Icelandic volcanic dust consists of higher proportion of submicron particles compared to crustal dust. The submicron particles are predicted to travel long distances. Moreover, such submicron particles pose considerable health risk because of high potential for entering the lungs. Icelandic volcanic glass has often fine pipe-vesicular structures known from asbestos and high content of heavy metals. Previous

  3. The fabrication of integrated carbon pipes with sub-micron diameters

    Science.gov (United States)

    Kim, B. M.; Murray, T.; Bau, H. H.

    2005-08-01

    A method for fabricating integrated carbon pipes (nanopipettes) of sub-micron diameters and tens of microns in length is demonstrated. The carbon pipes are formed from a template consisting of the tip of a pulled alumino-silicate glass capillary coated with carbon deposited from a vapour phase. This method renders carbon nanopipettes without the need for ex situ assembly and facilitates parallel production of multiple carbon-pipe devices. An electric-field-driven transfer of ions in a KCl solution through the integrated carbon pipes exhibits nonlinear current-voltage (I-V) curves, markedly different from the Ohmic I-V curves observed in glass pipettes under similar conditions. The filling of the nanopipette with fluorescent suspension is also demonstrated.

  4. EQUIPMENT FOR NONDESTRUCTIVE TESTING OF SILICON WAFERS SUBMICRON TOPOLOGY DURING THE FABRICATION OF INTEGRATED CIRCUITS

    Directory of Open Access Journals (Sweden)

    S. A. Chizhik

    2013-01-01

    Full Text Available The advantages of using an atomic force microscopy in manufacturing of submicron integrated circuits are described. The possibilities of characterizing the surface morphology and the etching profile for silicon substrate and bus lines, estimation of the periodicity and size of bus lines, geometrical stability for elementary bus line are shown. Methods of optical and atomic force microcopies are combined in one diagnostic unit. Scanning  probe  microscope  (SPM  200  is  designed  and  produced.  Complex  SPM  200  realizes  nondestructive control of microelectronics elements made on silicon wafers up to 200 mm in diameter and it is introduced by JSC «Integral» for the purpose of operational control, metrology and acceptance of the final product.

  5. Pressing induced polymorphic phase transition in submicron-sized gamma-HMX

    Science.gov (United States)

    Moore, David; Lee, Kien-Yin

    2007-06-01

    Submicron HMX has been produced and characterized to be less sensitive than impact standard HMX in small-scale sensitivity tests. The sm-HMX was found to be the gamma polymorph and to be stable under ambient conditions for at least a year. Pressing of sm-HMX in a small diameter pellet press at pressures from 10 000 psi to 31 000 psi and 1 to 5 minute hold times was found to promote the gamma to beta polymorphic phase transition. The fraction converted and rate of conversion versus time after pellet removal from the press were found to fit a sigmoidal curve, indicating nucleation and growth as a possible polymorphic transition mechanism.

  6. A 45 nm Stacked CMOS Image Sensor Process Technology for Submicron Pixel.

    Science.gov (United States)

    Takahashi, Seiji; Huang, Yi-Min; Sze, Jhy-Jyi; Wu, Tung-Ting; Guo, Fu-Sheng; Hsu, Wei-Cheng; Tseng, Tung-Hsiung; Liao, King; Kuo, Chin-Chia; Chen, Tzu-Hsiang; Chiang, Wei-Chieh; Chuang, Chun-Hao; Chou, Keng-Yu; Chung, Chi-Hsien; Chou, Kuo-Yu; Tseng, Chien-Hsien; Wang, Chuan-Joung; Yaung, Dun-Nien

    2017-12-05

    A submicron pixel's light and dark performance were studied by experiment and simulation. An advanced node technology incorporated with a stacked CMOS image sensor (CIS) is promising in that it may enhance performance. In this work, we demonstrated a low dark current of 3.2 e-/s at 60 °C, an ultra-low read noise of 0.90 e-·rms, a high full well capacity (FWC) of 4100 e-, and blooming of 0.5% in 0.9 μm pixels with a pixel supply voltage of 2.8 V. In addition, the simulation study result of 0.8 μm pixels is discussed.

  7. Formation of stable submicron peptide or protein particles by thin film freezing

    Energy Technology Data Exchange (ETDEWEB)

    Johnston, Keith P.; Engstrom, Joshua; Williams, III, Robert O.

    2017-04-18

    The present invention includes compositions and methods for preparing micron-sized or submicron-sized particles by dissolving a water soluble effective ingredient in one or more solvents; spraying or dripping droplets solvent such that the effective ingredient is exposed to a vapor-liquid interface of less than 50, 100, 150, 200, 250, 200, 400 or 500 cm.sup.-1 area/volume to, e.g., increase protein stability; and contacting the droplet with a freezing surface that has a temperature differential of at least 30.degree. C. between the droplet and the surface, wherein the surface freezes the droplet into a thin film with a thickness of less than 500 micrometers and a surface area to volume between 25 to 500 cm.sup.-1.

  8. Vectors and submicron precision: redundancy and 3D stacking in silicon pixel detectors

    CERN Document Server

    Heijne, E H M; Wong, W; Idarraga, J; Visser, J; Jakubek, J; Leroy, C; Turecek, D; Visschers, J; Pospisil, S; Ballabriga, R; Vykydal, Z; Vermeulen, J; Plackett, R; Heijne, E H M; Llopart, X; Boltje, D; Campbell, M

    2010-01-01

    Measurements are shown of GeV pions and muons in two 300 mu m thick, Si Medipix pixel detector assemblies that are stacked on top of each other, with a 25 mu m thick brass foil in between. In such a radiation imaging semiconductor matrix with a large number of pixels along the particle trail, one can determine local space vectors for the particle trajectory instead of points. This improves pattern recognition and track reconstruction, especially in a crowded environment. Stacking of sensor planes is essential for resolving directional ambiguities. Signal charge sharing can be employed for measuring positions with submicron precision. In the measurements one notices accompanying `delta' electrons that emerge outside the particle trail, far beyond the boundaries of the 55 mu m pixel cells. The frequency of such corrupted position measurements is similar to one per 2.5mm of traversed Si.

  9. Backward Masked Snakes and Guns Modulate Spatial Attention

    OpenAIRE

    Joshua M. Carlson; Andrea L. Fee; Reinke, Karen S.

    2009-01-01

    Fearful faces are important social cues that alert others of potential threat. Even backward masked fearful faces facilitate spatial attention. However, visual stimuli other than fearful faces can signal potential threat. Indeed, unmasked snakes and spiders modulate spatial attention. Yet, it is unclear if the rapid threat-related facilitation of spatial attention to backward masked stimuli is elicited by non-face threat cues. Evolutionary theories claim that phylogenetic threats (i.e. snakes...

  10. A phase mask fiber grating and sensing applications

    Directory of Open Access Journals (Sweden)

    Preecha P. Yupapin

    2003-09-01

    Full Text Available This paper presents an investigation of a fabricated fiber grating device characteristics and its applications, using a phase mask writing technique. The use of a most common UV phase laser (KrF eximer laser, with high intensity light source was focussed to the phase mask for writing on a fiber optic sample. The device (i.e. grating characteristic especially, in sensing application, was investigated. The possibility of using such device for temperature and strain sensors is discussed.

  11. Effectiveness of activated carbon masks in preventing anticancer drug inhalation

    OpenAIRE

    Sato, Junya; Kogure, Atushi; Kudo, Kenzo

    2016-01-01

    Background The exposure of healthcare workers to anticancer drugs such as cyclophosphamide (CPA) is a serious health concern. Anticancer drug pollution may spread outside biological safety cabinets even when a closed system is used. The inhalation of vaporized anticancer drugs is thought to be the primary route of exposure. Therefore, it is important that healthcare workers wear masks to prevent inhalation of anticancer drugs. However, the permeability of medical masks to vaporized anticancer...

  12. Ferromagnetic shadow mask for spray coating of polymer patterns

    DEFF Research Database (Denmark)

    Keller, Stephan Sylvest; Bosco, Filippo; Boisen, Anja

    2013-01-01

    We present the fabrication of a wafer-scale shadow mask with arrays of circular holes with diameters of 150–400 μm. Standard UV photolithography is used to define 700 μm thick SU-8 structures followed by electroplating of nickel and etching of the template. The ferromagnetic properties of the sha...... of the shadow mask allow magnetic clamping to the substrate and spray coating of well defined polymer patterns....

  13. Enhancing fullchip ILT mask synthesis capability for IC manufacturability

    Science.gov (United States)

    Cecil, Thomas; Ashton, Chris; Irby, David; Luan, Lan; Son, D. H.; Xiao, Guangming; Zhou, Xin; Kim, David; Gleason, Bob; Lee, H. J.; Sim, W. J.; Hong, M. J.; Jung, S. G.; Suh, S. S.; Lee, S. W.

    2011-04-01

    It is well known in the industry that the technology nodes from 30nm and below will require model based SRAF / OPC for critical layers to meet production required process windows. Since the seminal paper by Saleh and Sayegh[1][2] thirty years ago, the idea of using inverse methods to solve mask layout problems has been receiving increasing attention as design sizes have been steadily shrinking. ILT in its present form represents an attempt to construct the inverse solution to a constrained problem where the constraints are all possible phenomena which can be simulated, including: DOF, sidelobes, MRC, MEEF, EL, shot-count, and other effects. Given current manufacturing constraints and process window requirements, inverse solutions must use all possible degrees of freedom to synthesize a mask. Various forms of inverse solutions differ greatly with respect to lithographic performance and mask complexity. Factors responsible for their differences include composition of the cost function that is minimized, constraints applied during optimization to ensure MRC compliance and limit complexity, and the data structure used to represent mask patterns. In this paper we describe the level set method to represent mask patterns, which allows the necessary degrees of freedom for required lithographic performance, and show how to derive Manhattan mask patterns from it, which can be manufactured with controllable complexity and limited shot-counts. We will demonstrate how full chip ILT masks can control e-beam write-time to the level comparable to traditional OPC masks, providing a solution with maximized lithographic performance and manageable cost of ownership that is vital to sub-30nm node IC manufacturing.

  14. Taste-masked tacrolimus-phospholipid nanodispersions: dissolution enhancement, taste masking and reduced gastric complications.

    Science.gov (United States)

    Zidan, Ahmed S

    2017-03-01

    Through the integration of orthogonal central composite design and desirability function, this work aimed to explore the potential of quality by design in understanding the formulation of phospholipid-stabilized tacrolimus nanodispersions by microfluidization. The influence of homogenization pressure, microfluidization time and phospholipid concentration (X1-X3) on nanodispersion performance was studied. Nanodispersions were characterized by differential scanning calorimetric (DSC), X-ray diffractometer (XRD) and Fourier transform infrared (FTIR) analysis. Moreover, masking the unpalatable taste of tacrolimus and reducing the gastric complications were also evaluated. FTIR analysis indicated its interaction with phospholipid. DSC and XRD analysis revealed the amorphous transformation of tacrolimus within nanodispersions. The dissolution was enhanced by 35 folds and 15 folds after 0.5 and 2 h, respectively. Maximum tacrolimus content, yield, polydispersity index, percentages dissolved after 0.5 and 2 h of 99.3%, 100%, 0.864, 39.7% and 95.3%, respectively, with particle size of 160 nm were obtained at X1, X2 and X3 values of 20 000 psi, 6 min and 30%, respectively. The Euclidean distance values demonstrated masking the unpalatable taste and taste perversion to stimuli of tacrolimus in its optimized nanodispersion. Moreover, the ulcerative indices following raw tacrolimus and its optimized nanodispersion oral administration were 6.73 and 2.45, respectively, to indicate that nanodispersion was significantly less irritating to the gastric mucosa.

  15. Analysis of major air pollutants and submicron particles in New York City and Long Island

    Science.gov (United States)

    Masiol, M.; Hopke, P. K.; Felton, H. D.; Frank, B. P.; Rattigan, O. V.; Wurth, M. J.; LaDuke, G. H.

    2017-01-01

    A year-long sampling campaign of major air pollutants and submicron particle number size distributions was conducted at two sites taken as representative of city-wide air quality in New York City and Long Island, respectively. A number of species were quantified with hourly time resolution, including particle number concentrations in 6 size ranges (20-30 nm, 30-50 nm, 50-70 nm, 70-100 nm, 100-200 nm, and >200 nm), nitrogen oxides, sulfur dioxide, ozone, carbon monoxide, methane, non-methane hydrocarbons, PM2.5 mass concentration and some PM major components (sulfate, organic and elemental carbon). Hourly concentrations of primary and secondary organic carbon were estimated using the EC tracer method. Data were matched with weather parameters and air parcel back-trajectories. A series of tools were thus applied to: (i) study the seasonal, weekly, diurnal cycles of pollutants; (ii) investigate the relationships amongst pollutants through correlation and lagged correlation analyses; (iii) depict the role of atmospheric photochemical processes; (iv) examine the location of the potential sources by mean of conditional bivariate probability function analysis and (v) investigate the role of regional transport of air masses to the concentrations of analyzed species. Results indicate that concentrations of NOx, SO2, CO, non-methane hydrocarbons, primary OC and EC are predominantly determined by local sources, but are also affected by regional transports of polluted air masses. On the contrary, the transport of continental polluted air masses has a main effect in raising the concentrations of secondary PM2.5 (sulfate and secondary organic carbon). By providing direct information on the concentrations and trends of key pollutants and submicron particle number concentrations, this study finally enables some general considerations about air quality status and atmospheric processes over the New York City metropolitan area.

  16. Bacterial characterization in ambient submicron particles during severe haze episodes at Ji'nan, China.

    Science.gov (United States)

    Xu, Caihong; Wei, Min; Chen, Jianmin; Wang, Xinfeng; Zhu, Chao; Li, Jiarong; Zheng, Lulu; Sui, Guodong; Li, Weijun; Wang, Wenxing; Zhang, Qingzhu; Mellouki, Abdelwahid

    2017-02-15

    In January 2014, severe haze episodes which sweep across Chinese cities have attracted public concern and interest at home and abroad. In addition to the physicochemical properties of air pollutants, bacteria are thought to be responsible for the spread of respiratory diseases and various allergies. We attempted the bacterial characterization of submicron particles (PM 0.18-0.32 , PM 0.32-0.56 , and PM 0.56-1 ) under severe haze episodes using high-throughput sequencing and real-time quantitative PCR detecting system based on 21 samples collected from January to March 2014 at Ji'nan, China. The high bacterial concentration in PM 0.32-0.56 (7314cells m -3 ), PM 0.18-0.32 (7212cells m -3 ), and PM 0.56-1 (6982cells m -3 ) showed significant negative correlations with SO 2 , NO 2, and O 3 . Under sufficient sequencing depth, 37 phyla, 71 classes, 137 orders, 236 families, and 378 genera were classified, and the bacterial community structure varied significantly in different size fractions. For example, Holophagaceae (Acidobacteria) in PM 0.32-0.56 showed 6-fold higher abundance than that in PM 0.18-0.32 . Moreover, functional categories and bacterial species (Lactococcus piscium, Pseudomonas fragi, Streptococcus agalactiae, and Pseudomonas cichorii) that may potentially be responsible for infections and allergies were also discovered. Source track analysis showed that the ambient bacteria mainly originated from soils, leaf surfaces, and feces. Our results highlighted the importance of airborne microbial communities by understanding the concentration, structure, ecological and health effects, especially those in submicron particles during haze episodes. Copyright © 2016. Published by Elsevier B.V.

  17. Source Separation via Spectral Masking for Speech Recognition Systems

    Directory of Open Access Journals (Sweden)

    Gustavo Fernandes Rodrigues

    2012-12-01

    Full Text Available In this paper we present an insight into the use of spectral masking techniques in time-frequency domain, as a preprocessing step for the speech signal recognition. Speech recognition systems have their performance negatively affected in noisy environments or in the presence of other speech signals. The limits of these masking techniques for different levels of the signal-to-noise ratio are discussed. We show the robustness of the spectral masking techniques against four types of noise: white, pink, brown and human speech noise (bubble noise. The main contribution of this work is to analyze the performance limits of recognition systems  using spectral masking. We obtain an increase of 18% on the speech hit rate, when the speech signals were corrupted by other speech signals or bubble noise, with different signal-to-noise ratio of approximately 1, 10 and 20 dB. On the other hand, applying the ideal binary masks to mixtures corrupted by white, pink and brown noise, results an average growth of 9% on the speech hit rate, with the same different signal-to-noise ratio. The experimental results suggest that the masking spectral techniques are more suitable for the case when it is applied a bubble noise, which is produced by human speech, than for the case of applying white, pink and brown noise.

  18. Dynamic mask: new approach to laser engraving of halftone images

    Science.gov (United States)

    Kadan, Victor N.; Pekarik, Alexander S.; Estrela Liopis, Rafael V.

    1997-03-01

    New approach to laser engraving of half tone images has been proposed and tested. Combining two basic approaches to laser engraving -- single pulse mask imaging and raster element construction by pack of laser pulses -- the new system constructs every individual raster element by imaging on the workpiece surface a dynamic mask of controlled size. The dynamic mask shape corresponds to the required raster element shape. This approach offers several important advantages over the conventional ones: (1) analog control of the mask shape provides gray level continuum, thus ensuring the image quality, unattainable by other means; (2) raster element marking by single laser pulse provides very good marking rate. It takes only one scan of the writing laser head to mark raster line. Much more powerful laser pulses can be used to engrave complete raster element by single pulse instead of its point-by-point construction by consecutive laser pulses; (3) the influence of laser beam quality parameters, such as beam divergence, and power instabilities on the gray level has been greatly reduced because raster element shape primarily depends on the mask shape and not on the power level and beam divergence. Dynamic mask system can be used both with cw and pulsed laser. Gray scale tones can be reproduced by the linear raster line width in the first case. Advantages of the new device have been demonstrated by engravings on stone, wood, etc. made with 50 W carbon-dioxide laser.

  19. Face mask ventilation--the dos and don'ts.

    Science.gov (United States)

    Wood, Fiona E; Morley, Colin J

    2013-12-01

    Face mask ventilation provides respiratory support to newly born or sick infants. It is a challenging technique and difficult to ensure that an appropriate tidal volume is delivered because large and variable leaks occur between the mask and face; airway obstruction may also occur. Technique is more important than the mask shape although the size must appropriately fit the face. The essence of the technique is to roll the mask on to the face from the chin while avoiding the eyes, with a finger and thumb apply a strong even downward pressure to the top of the mask, away from the stem and sloped sides or skirt of the mask, place the other fingers under the jaw and apply a similar upward pressure. Preterm infants require continuous end-expiratory pressure to facilitate lung aeration and maintain lung volume. This is best done with a T-piece device, not a self-inflating or flow-inflating bag. Copyright © 2013 Elsevier Ltd. All rights reserved.

  20. Status of EUVL mask development in Europe (Invited Paper)

    Science.gov (United States)

    Peters, Jan H.

    2005-06-01

    EUV lithography is the prime candidate for the next generation lithography technology after 193 nm immersion lithography. The commercial onset for this technology is expected for the 45 nm half-pitch technology or below. Several European and national projects and quite a large number of companies and research institutions in Europe work on various aspects of the technological challenges to make EUV a commercially viable technology in the not so far future. Here the development of EUV sources, the development of an EUV exposure tools, metrology tools dedicated for characterization of mask, the production of EUV mask blanks and the mask structuring itself are the key areas in which major activities can be found. In this talk we will primarily focus on those activities, which are related to establish an EUV mask supply chain with all its ingredients from substrate production, polishing, deposition of EUV layers, blank characterization, mask patterning process and the consecutive metrology and defect inspection as well as shipping and handling from blank supply to usage in the wafer fab. The EUV mask related projects on the national level are primarily supported by the French Ministry of Economics and Finance (MinEFi) and the German Ministry of Education and Research (BMBF).

  1. A pattern-based method to automate mask inspection files

    Science.gov (United States)

    Kamal Baharin, Ezni Aznida Binti; Muhsain, Mohamad Fahmi Bin; Ahmad Ibrahim, Muhamad Asraf Bin; Ahmad Noorhani, Ahmad Nurul Ihsan Bin; Sweis, Jason; Lai, Ya-Chieh; Hurat, Philippe

    2017-03-01

    Mask inspection is a critical step in the mask manufacturing process in order to ensure all dimensions printed are within the needed tolerances. This becomes even more challenging as the device nodes shrink and the complexity of the tapeout increases. Thus, the amount of measurement points and their critical dimension (CD) types are increasing to ensure the quality of the mask. In addition to the mask quality, there is a significant amount of manpower needed when the preparation and debugging of this process are not automated. By utilizing a novel pattern search technology with the ability to measure and report match region scan-line (edge) measurements, we can create a flow to find, measure and mark all metrology locations of interest and provide this automated report to the mask shop for inspection. A digital library is created based on the technology product and node which contains the test patterns to be measured. This paper will discuss how these digital libraries will be generated and then utilized. As a time-critical part of the manufacturing process, this can also reduce the data preparation cycle time, minimize the amount of manual/human error in naming and measuring the various locations, reduce the risk of wrong/missing CD locations, and reduce the amount of manpower needed overall. We will also review an example pattern and how the reporting structure to the mask shop can be processed. This entire process can now be fully automated.

  2. Modulation of Heterotypic and Homotypic Cell-Cell Interactions via Zwitterionic Lipid Masks.

    Science.gov (United States)

    Park, Matthew; Youn, Wongu; Kim, Doyeon; Ko, Eun Hyea; Kim, Beom Jin; Kang, Sung Min; Kang, Kyungtae; Choi, Insung S

    2017-08-01

    Since the pioneering work by Whitesides, innumerable platforms that aim to spatio-selectively seed cells and control the degree of cell-cell interactions in vitro have been developed. These methods, however, have generally been technically and methodologically complex, or demanded stringent materials and conditions. In this work, we introduce zwitterionic lipids as patternable, cell-repellant masks for selectively seeding cells. The lipid masks are easily removed with a routine washing step under physiological conditions (37 °C, pH 7.4), and are used to create patterned cocultures, as well as to conduct cell migration studies. We demonstrate, via patterned cocultures of NIH 3T3 fibroblasts and HeLa cells, that HeLa cells proliferate far more aggressively than NIH 3T3 cells, regardless of initial population sizes. We also show that fibronectin-coated substrates induce cell movement akin to collective migration in NIH 3T3 fibroblasts, while the cells cultured on unmodified substrates migrate independently. Our lipid mask platform offers a rapid and highly biocompatible means of selectively seeding cells, and acts as a versatile tool for the study of cell-cell interactions. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

  3. Neopuff T-piece resuscitator mask ventilation: Does mask leak vary with different peak inspiratory pressures in a manikin model?

    Science.gov (United States)

    Maheshwari, Rajesh; Tracy, Mark; Hinder, Murray; Wright, Audrey

    2017-08-01

    The aim of this study was to compare mask leak with three different peak inspiratory pressure (PIP) settings during T-piece resuscitator (TPR; Neopuff) mask ventilation on a neonatal manikin model. Participants were neonatal unit staff members. They were instructed to provide mask ventilation with a TPR with three PIP settings (20, 30, 40 cm H2 O) chosen in a random order. Each episode was for 2 min with 2-min rest period. Flow rate and positive end-expiratory pressure (PEEP) were kept constant. Airway pressure, inspiratory and expiratory tidal volumes, mask leak, respiratory rate and inspiratory time were recorded. Repeated measures analysis of variance was used for statistical analysis. A total of 12 749 inflations delivered by 40 participants were analysed. There were no statistically significant differences (P > 0.05) in the mask leak with the three PIP settings. No statistically significant differences were seen in respiratory rate and inspiratory time with the three PIP settings. There was a significant rise in PEEP as the PIP increased. Failure to achieve the desired PIP was observed especially at the higher settings. In a neonatal manikin model, the mask leak does not vary as a function of the PIP when the flow rate is constant. With a fixed rate and inspiratory time, there seems to be a rise in PEEP with increasing PIP. © 2017 Paediatrics and Child Health Division (The Royal Australasian College of Physicians).

  4. Processing different kinds of semantic relations in picture-word interference with non-masked and masked distractors

    Directory of Open Access Journals (Sweden)

    Markus F Damian

    2014-10-01

    Full Text Available Spoken production requires lexical selection, guided by the conceptual representation of the to-be-named target. Currently, the question whether lexical selection is subject to competition is hotly debated. In the picture-word interference task, manipulating the visibility of written distractor words provides important insights: clearly visible categorically related distractors cause interference whereas masked distractors induce facilitation (Finkbeiner, M., & Caramazza, A., 2006. Now you see it, now you don’t: On turning semantic interference into facilitation in a Stoop-like task. Cortex. We explored the effect of distractor masking in more depth by investigating its interplay with different types of semantic overlap. Specifically, we contrasted categorical with associatively based relatedness. For the former, we replicated the polarity reversal in semantic effects dependent on whether distractors were masked or not. Post-experimental visibility tests showed that weak semantic facilitation with masked distractors did not depend on individual variability in participants’ ability to perceive the distractors. Associatively related distractors showed facilitation with non-masked presentation, but little effect when masked. Overall, the results suggest that it is primarily distractor activation strength which determines whether semantic effects are facilitatory or interfering in PWI tasks.

  5. Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) for 100 μm-thick submicron patterns with an aspect ratio over 100.

    Science.gov (United States)

    Kim, Kwanghyun; Yu, Sunyoung; Kim, Sung-Wook; Kim, Taegeon; Kim, Sang-Min; Kang, Se-Young; Han, Seung Min; Jang, Ji-Hyun

    2017-07-18

    This is the first report on the fabrication of defect-free submicron structures with more than 100 μm thickness and an aspect ratio over 100. Highly transparent poly(glycidyl methacrylate-co-acryloisobutyl POSS) (PGP) was synthesized via radical polymerization. The mechanical properties of the PGP submicron structure displayed a Young's modulus of 6.09 GPa and a hardness of 0.16 GPa, 4.2 and 8 times, respectively, than those of SU8 nanopatterns. These enhancements enable the utilization of ultrathick 2D-/3D-submicron structures as an ideal platform for microelectromechanical systems, big data storage systems, energy devices, etc.

  6. High energy X-ray phase and dark-field imaging using a random absorption mask.

    Science.gov (United States)

    Wang, Hongchang; Kashyap, Yogesh; Cai, Biao; Sawhney, Kawal

    2016-07-28

    High energy X-ray imaging has unique advantage over conventional X-ray imaging, since it enables higher penetration into materials with significantly reduced radiation damage. However, the absorption contrast in high energy region is considerably low due to the reduced X-ray absorption cross section for most materials. Even though the X-ray phase and dark-field imaging techniques can provide substantially increased contrast and complementary information, fabricating dedicated optics for high energies still remain a challenge. To address this issue, we present an alternative X-ray imaging approach to produce transmission, phase and scattering signals at high X-ray energies by using a random absorption mask. Importantly, in addition to the synchrotron radiation source, this approach has been demonstrated for practical imaging application with a laboratory-based microfocus X-ray source. This new imaging method could be potentially useful for studying thick samples or heavy materials for advanced research in materials science.

  7. Broadband noise masks suppress neural responses to narrowband stimuli

    Directory of Open Access Journals (Sweden)

    Daniel Hart Baker

    2014-07-01

    Full Text Available White pixel noise is widely used to estimate the level of internal noise in a system by injecting external variance into the detecting mechanism. Recent work (Baker & Meese, 2012, J Vis, 12(10:20 has provided psychophysical evidence that such noise masks might also cause suppression that could invalidate estimates of internal noise. Here we measure neural population responses directly, using steady-state visual evoked potentials, elicited by target stimuli embedded in different mask types. Sinusoidal target gratings of 1c/deg flickered at 5Hz, and were shown in isolation, or with superimposed orthogonal grating masks or 2D white noise masks, flickering at 7Hz. Compared with responses to a blank screen, the Fourier amplitude at the target frequency increased monotonically as a function of target contrast when no mask was present. Both orthogonal and white noise masks caused rightward shifts of the contrast response function, providing evidence of contrast gain control suppression. We also calculated within-observer amplitude variance across trials. This increased in proportion to the target response, implying signal-dependent (i.e. multiplicative noise at the system level, the implications of which we discuss for behavioural tasks. This measure of variance was reduced by both mask types, consistent with the changes in mean target response. An alternative variety of noise, which we term zero-dimensional noise, involves trial-by-trial jittering of the target contrast. This type of noise produced no gain control suppression, and increased the amplitude variance across trials.

  8. Cardiovascular Risk Factors and Masked Hypertension: The Jackson Heart Study.

    Science.gov (United States)

    Bromfield, Samantha G; Shimbo, Daichi; Booth, John N; Correa, Adolfo; Ogedegbe, Gbenga; Carson, April P; Muntner, Paul

    2016-12-01

    Masked hypertension is associated with increased risk for cardiovascular disease. Identifying modifiable risk factors for masked hypertension could provide approaches to reduce its prevalence. Life's Simple 7 is a measure of cardiovascular health developed by the American Heart Association that includes body mass index, physical activity, diet, cigarette smoking, blood pressure (BP), cholesterol, and glucose. We examined the association between cardiovascular health and masked daytime hypertension in the Jackson Heart Study, an exclusively African American cohort. Life's Simple 7 factors were assessed during a study visit and categorized as poor, intermediate, or ideal. Ambulatory BP monitoring was performed after the study visit. Using BP measured between 10:00 am and 8:00 pm on ambulatory BP monitoring, masked daytime hypertension was defined as mean clinic systolic BP/diastolic BP hypertension. The multivariable-adjusted prevalence ratios for masked daytime hypertension comparing participants with 2, 3, and ≥4 versus ≤1 ideal Life's Simple 7 factors were 0.99 (95% confidence interval [CI], 0.74-1.33), 0.77 (95% CI, 0.57-1.03), and 0.51 (95% CI, 0.33-0.79), respectively. Masked daytime hypertension was less common among participants with ideal versus poor levels of physical activity (ratio, 0.74; 95% CI, 0.56-1.00), ideal or intermediate levels pooled together versus poor diet (prevalence ratio, 0.73; 95% CI, 0.58-0.91), ideal versus poor levels of cigarette smoking (prevalence ratio, 0.61; 95% CI, 0.46-0.82), and ideal versus intermediate levels of clinic BP (prevalence ratio, 0.28, 95% CI, 0.16-0.48). Better cardiovascular health is associated with a lower preva lence of masked hypertension. © 2016 American Heart Association, Inc.

  9. Correction: Inferior alveolar nerve injury with laryngeal mask airway: a case report.

    LENUS (Irish Health Repository)

    Hanumanthaiah, Deepak

    2011-11-30

    ABSTRACT: Following the publication of our article [Inferior alveolar nerve injury with laryngeal mask airway: a case report. Journal of Medical Case Reports 2011, 5:122] it was brought to our attention that we inadvertently used the registered trademark of the Laryngeal Mask Company Limited (LMA) as the abbreviation for laryngeal mask airway. A Portex(R) Soft Seal(R) Laryngeal Mask was used and not a device manufactured by the Laryngeal Mask Company.

  10. Quality of patient positioning during cerebral tomotherapy irradiation using different mask systems

    Energy Technology Data Exchange (ETDEWEB)

    Leitzen, C.; Wilhelm-Buchstab, T.; Garbe, S.; Luetter, C.; Muedder, T.; Simon, B.; Schild, H.H.; Schueller, H. [Universitaetsklinik Bonn, Radiologische Klinik, FE Strahlentherapie, Bonn (Germany)

    2014-04-15

    Patient immobilization during brain tumor radiotherapy is achieved by employing different mask systems. Two innovative mask systems were developed to minimize the problems of claustrophobic patients. Our aim was to evaluate whether the quality of patient immobilization using the new mask systems was equivalent to the standard mask system currently in use. Thirty-three patients with cerebral target volumes were irradiated using the Hi-Art II tomotherapy system between 2010 and 2012. Each group of 11 patients was fitted with one of the two new mask systems (Crystal {sup registered} or Open Face {sup registered} mask, Orfit) or the standard three-point mask (Raycast {sup registered} -HP, Orfit) and a total of 557 radiotherapy fractions were evaluated. After positioning was checked by MV-CT, the necessary table adjustments were noted. Data were analyzed by comparing the groups, and safety margins were calculated for nonimage-guided irradiation. The mean values of the table adjustments were: (a) lateral (mm): -0.22 (mask 1, standard deviation (σ): 2.15); 1.1 (mask 2, σ: 2.4); -0.64 (mask 3, σ: 2.9); (b) longitudinal (mm): -1 (mask 1, σ: 2.57); -0.5 (mask 2, σ: 4.7); -1.22 (mask 3, σ: 2.52); (c) vertical (mm): 0.62 (mask 1, σ: 0.63); 1.2 (mask 2, σ: 1.0); 0.57 (mask 3, σ: 0.28); (d) roll: 0.35 (mask 1, σ: 0.75); 0 (mask 2, σ: 0.8); 0.02 (mask 3, σ: 1.12). The outcomes suggest necessary safety margins of 5.49-7.38 mm (lateral), 5.4-6.56 mm (longitudinal), 0.82-3.9 mm (vertical), and 1.93-4.5 (roll). There were no significant differences between the groups. The new mask systems improve patient comfort while providing consistent patient positioning. (orig.)

  11. Post-processing optimization of electrospun submicron poly(3-hydroxybutyrate) fibers to obtain continuous films of interest in food packaging applications.

    Science.gov (United States)

    Cherpinski, Adriane; Torres-Giner, Sergio; Cabedo, Luis; Lagaron, Jose M

    2017-10-01

    Polyhydroxyalkanoates (PHAs) are one of the most researched family of biodegradable polymers based on renewable materials due to their thermoplastic nature and moisture resistance. The present study was targeted to investigate the preparation and characterization of poly(3-hydroxybutyrate) (PHB) films obtained through the electrospinning technique. To convert them into continuous films and then to increase their application interest in packaging, the electrospun fiber mats were subsequently post-processed by different physical treatments. Thus, the effect of annealing time and cooling method on morphology, molecular order, thermal, optical, mechanical, and barrier properties of the electrospun submicron PHB fibers was studied. Annealing at 160°C, well below the homopolyester melting point, was found to be the minimum temperature at which homogeneous transparent films were produced. The film samples that were cooled slowly after annealing showed the lowest permeability to oxygen, water vapor, and limonene. The optimally post-processed electrospun PHB fibers exhibited similar rigidity to conventional compression-molded PHA films, but with enhanced elongation at break and toughness. Films made by this electrospinning technique have many potential applications, such as in the design of barrier layers, adhesive interlayers, and coatings for fiber- and plastic-based food packaging materials.

  12. Bottom-up synthesis of up-converting submicron-sized Er{sup 3+}-doped LiNbO{sub 3} particles

    Energy Technology Data Exchange (ETDEWEB)

    Jardiel, T., E-mail: jardiel@icv.csic.es [Departamento de Electroceramica, Instituto de Ceramica y Vidrio-CSIC, Kelsen 5, 28049 Madrid (Spain); Caballero, A.C. [Departamento de Electroceramica, Instituto de Ceramica y Vidrio-CSIC, Kelsen 5, 28049 Madrid (Spain); Marin-Dobrincic, M.; Cantelar, E.; Cusso, F. [Departamento de Fisica de Materiales, C-04, Facultad de Ciencias, Universidad Autonoma de Madrid, Avda. Francisco Tomas y Valiente 7, 28049 Madrid (Spain)

    2012-08-15

    A new and simple wet chemical synthesis method is proposed to prepare submicron-sized Erbium-doped LiNbO{sub 3} powders. The synthesis procedure comprises the co-precipitation of lithium and erbium ions from common precursors and their subsequent reaction with niobium ethoxide. A systematic characterization by means of X-Ray Diffraction (XRD), X-ray Fluorescence (XRF), Inductively Coupled Plasma (ICP-OES), Atomic Absorption (AAS), Field Emission Scanning Electron Microscopy (FE-SEM), as well as by the examination of the luminescence properties, evidence that with this method a congruent Er{sup 3+}-doped LiNbO{sub 3} single phase material can be obtained without using complex and time-consuming processing steps. The synthesized powders exhibit efficient IR to VIS up-conversion emissions under 974 nm pumping. -- Highlights: Black-Right-Pointing-Pointer A novel chemical route to the preparation of LiNbO{sub 3} powders has been developed. Black-Right-Pointing-Pointer This process avoids complex and time-consuming processing steps. Black-Right-Pointing-Pointer A congruent Er{sup 3+}-doped LiNbO{sub 3} single phase material can be obtained by this way. Black-Right-Pointing-Pointer The luminescence properties are the expected for this composition.

  13. Comparison of the OxyMask and Venturi Mask in the Delivery of Supplemental Oxygen: Pilot Study in Oxygen-Dependent Patients

    Directory of Open Access Journals (Sweden)

    Jaime M Beecroft

    2006-01-01

    Full Text Available BACKGROUND: The OxyMask (Southmedic Inc, Canada is a new face mask for oxygen delivery that uses a small ‘diffuser’ to concentrate and direct oxygen toward the mouth and nose. The authors hypothesized that this unique design would enable the OxyMask to deliver oxygen more efficiently than a Venturi mask (Hudson RCI, USA in patients with chronic hypoxemia.

  14. Cycle time reduction by Html report in mask checking flow

    Science.gov (United States)

    Chen, Jian-Cheng; Lu, Min-Ying; Fang, Xiang; Shen, Ming-Feng; Ma, Shou-Yuan; Yang, Chuen-Huei; Tsai, Joe; Lee, Rachel; Deng, Erwin; Lin, Ling-Chieh; Liao, Hung-Yueh; Tsai, Jenny; Bowhill, Amanda; Vu, Hien; Russell, Gordon

    2017-07-01

    The Mask Data Correctness Check (MDCC) is a reticle-level, multi-layer DRC-like check evolved from mask rule check (MRC). The MDCC uses extended job deck (EJB) to achieve mask composition and to perform a detailed check for positioning and integrity of each component of the reticle. Different design patterns on the mask will be mapped to different layers. Therefore, users may be able to review the whole reticle and check the interactions between different designs before the final mask pattern file is available. However, many types of MDCC check results, such as errors from overlapping patterns usually have very large and complex-shaped highlighted areas covering the boundary of the design. Users have to load the result OASIS file and overlap it to the original database that was assembled in MDCC process on a layout viewer, then search for the details of the check results. We introduce a quick result-reviewing method based on an html format report generated by Calibre® RVE. In the report generation process, we analyze and extract the essential part of result OASIS file to a result database (RDB) file by standard verification rule format (SVRF) commands. Calibre® RVE automatically loads the assembled reticle pattern and generates screen shots of these check results. All the processes are automatically triggered just after the MDCC process finishes. Users just have to open the html report to get the information they need: for example, check summary, captured images of results and their coordinates.

  15. Metal oxide multilayer hard mask system for 3D nanofabrication

    Science.gov (United States)

    Han, Zhongmei; Salmi, Emma; Vehkamäki, Marko; Leskelä, Markku; Ritala, Mikko

    2018-02-01

    We demonstrate the preparation and exploitation of multilayer metal oxide hard masks for lithography and 3D nanofabrication. Atomic layer deposition (ALD) and focused ion beam (FIB) technologies are applied for mask deposition and mask patterning, respectively. A combination of ALD and FIB was used and a patterning procedure was developed to avoid the ion beam defects commonly met when using FIB alone for microfabrication. ALD grown Al2O3/Ta2O5/Al2O3 thin film stacks were FIB milled with 30 keV gallium ions and chemically etched in 5% tetramethylammonium hydroxide at 50 °C. With metal evaporation, multilayers consisting of amorphous oxides Al2O3 and Ta2O5 can be tailored for use in 2D lift-off processing, in preparation of embedded sub-100 nm metal lines and for multilevel electrical contacts. Good pattern transfer was achieved by lift-off process from the 2D hard mask for micro- and nano-scaled fabrication. As a demonstration of the applicability of this method to 3D structures, self-supporting 3D Ta2O5 masks were made from a film stack on gold particles. Finally, thin film resistors were fabricated by utilizing controlled stiction of suspended Ta2O5 structures.

  16. Secure information display by use of multiple decoding masks

    Science.gov (United States)

    Yamamoto, Hirotsugu; Hayasaki, Yoshio; Nishida, Nobuo

    2004-10-01

    Security has become an important issue as information technology has become increasingly pervasive in our everyday lives. Security risks arise with a display that shows decrypted information. In this paper, we propose a secure information display technique by use of visual cryptography. Its decryption requires no special computing devices and is implemented using only human vision. To improve security of the key to decode the encrypted displayed image, multiple decoding masks have been constructed based on visual secret sharing scheme. The proposed display appears as a random pattern to anyone who looks at it unless the person views the displayed image through stacked multiple decoding masks. We have constructed code sets to share the secret image information with a displayed image and multiple decoding masks. The decoding process is a kind of optical processing based on spatial encoding and it needs no computer calculation, which means that no decrypted data exists in a computer system. Thus, the proposed display technique is secure against theft of the decrypted data and eavesdropping of the display signals, and provides a limited viewing zone. Multiple decoding masks increase security of the decoding masks.

  17. Getting the cocktail party started: masking effects in speech perception

    Science.gov (United States)

    Evans, S; McGettigan, C; Agnew, ZK; Rosen, S; Scott, SK

    2016-01-01

    Spoken conversations typically take place in noisy environments and different kinds of masking sounds place differing demands on cognitive resources. Previous studies, examining the modulation of neural activity associated with the properties of competing sounds, have shown that additional speech streams engage the superior temporal gyrus. However, the absence of a condition in which target speech was heard without additional masking made it difficult to identify brain networks specific to masking and to ascertain the extent to which competing speech was processed equivalently to target speech. In this study, we scanned young healthy adults with continuous functional Magnetic Resonance Imaging (fMRI), whilst they listened to stories masked by sounds that differed in their similarity to speech. We show that auditory attention and control networks are activated during attentive listening to masked speech in the absence of an overt behavioural task. We demonstrate that competing speech is processed predominantly in the left hemisphere within the same pathway as target speech but is not treated equivalently within that stream, and that individuals who perform better in speech in noise tasks activate the left mid-posterior superior temporal gyrus more. Finally, we identify neural responses associated with the onset of sounds in the auditory environment, activity was found within right lateralised frontal regions consistent with a phasic alerting response. Taken together, these results provide a comprehensive account of the neural processes involved in listening in noise. PMID:26696297

  18. Mask roughness induced LER: geometric model at long correlation lengths

    Energy Technology Data Exchange (ETDEWEB)

    McClinton, Brittany M.; Naulleau, Patrick P.

    2011-02-11

    Collective understanding of how both the resist and line-edge roughness (LER) on the mask affect the final printed LER has made significant advances. What is poorly understood, however, is the extent to which mask surface roughness couples to image plane LER as a function of illumination conditions, NA, and defocus. Recently, progress has been made in formulating a simplified solution for mask roughness induced LER. Here, we investigate the LER behavior at long correlation lengths of surface roughness on the mask. We find that for correlation lengths greater than 3/NA in wafer dimensions and CDs greater than approximately 0.75/NA, the previously described simplified model, which remains based on physical optics, converges to a 'geometric regime' which is based on ray optics and is independent of partial coherence. In this 'geometric regime', the LER is proportional to the mask slope error as it propagates through focus, and provides a faster alternative to calculating LER in contrast to either full 2D aerial image simulation modeling or the newly proposed physical optics model. Data is presented for both an NA = 0.32 and an NA = 0.5 imaging system for CDs of 22-nm and 50-nm horizontal-line-dense structures.

  19. Multiresolution Multiscale Active Mask Segmentation of Fluorescence Microscope Images.

    Science.gov (United States)

    Srinivasa, Gowri; Fickus, Matthew; Kovačević, Jelena

    2009-01-01

    We propose an active mask segmentation framework that combines the advantages of statistical modeling, smoothing, speed and flexibility offered by the traditional methods of region-growing, multiscale, multiresolution and active contours respectively. At the crux of this framework is a paradigm shift from evolving contours in the continuous domain to evolving multiple masks in the discrete domain. Thus, the active mask framework is particularly suited to segment digital images. We demonstrate the use of the framework in practice through the segmentation of punctate patterns in fluorescence microscope images. Experiments reveal that statistical modeling helps the multiple masks converge from a random initial configuration to a meaningful one. This obviates the need for an involved initialization procedure germane to most of the traditional methods used to segment fluorescence microscope images. While we provide the mathematical details of the functions used to segment fluorescence microscope images, this is only an instantiation of the active mask framework. We suggest some other instantiations of the framework to segment different types of images.

  20. Phonological and Orthographic Overlap Effects in Fast and Masked Priming

    Science.gov (United States)

    Frisson, Steven; Bélanger, Nathalie N.; Rayner, Keith

    2014-01-01

    We investigated how orthographic and phonological information is activated during reading, using a fast priming task, and during single word recognition, using masked priming. Specifically, different types of overlap between prime and target were contrasted: high orthographic and high phonological overlap (track-crack), high orthographic and low phonological overlap (bear-gear), or low orthographic and high phonological overlap (fruit-chute). In addition, we examined whether (orthographic) beginning overlap (swoop-swoon) yielded the same priming pattern as end (rhyme) overlap (track-crack). Prime durations were 32 and 50ms in the fast priming version, and 50ms in the masked priming version, and mode of presentation (prime and target in lower case) was identical. The fast priming experiment showed facilitatory priming effects when both orthography and phonology overlapped, with no apparent differences between beginning and end overlap pairs. Facilitation was also found when prime and target only overlapped orthographically. In contrast, the masked priming experiment showed inhibition for both types of end overlap pairs (with and without phonological overlap), and no difference for begin overlap items. When prime and target only shared principally phonological information, facilitation was only found with a long prime duration in the fast priming experiment, while no differences were found in the masked priming version. These contrasting results suggest that fast priming and masked priming do not necessarily tap into the same type of processing. PMID:24365065

  1. Are personality traits associated with white coat and masked hypertension?

    Science.gov (United States)

    Terracciano, Antonio; Scuteri, Angelo; Strait, James; Sutin, Angelina R.; Meirelles, Osorio; Marongiu, Michele; Orru, Marco; Pilia, Maria Grazia; Ferrucci, Luigi; Cucca, Francesco; Schlessinger, David; Lakatta, Edward

    2014-01-01

    Objectives Anxiety and other psychological dispositions are thought to be associated with blood pressure. This study tests whether personality traits have long-term associations with masked and white coat effects. Methods A community-based sample of 2,838 adults from Sardinia (Italy) completed the Revised NEO Personality Inventory and seven years later blood pressure was assessed in the clinic and with ambulatory monitoring. Logistic regressions were used to test whether anxiety, neuroticism, extraversion, openness, agreeableness, and conscientiousness predicted the white coat and masked hypertension phenomena. Age, sex, and antihypertensive medication use were tested as moderators. Results Significant interactions were found between personality traits and antihypertensive medications in predicting masked and white coat effects. Only among those taking antihypertensive medication, higher anxiety was associated with a higher risk of pseudo-resistant hypertension due to white coat effect (OR = 1.39, 95%CI = 1.01–1.91) and higher conscientiousness was associated with a lower risk of masked uncontrolled hypertension (OR = 0.70, 95%CI = 0.49–0.99). There were no significant interactions with age or sex. Conclusions Among those on antihypertensive medications, anxious individuals were more likely to have pseudo-resistant hypertension due to white coat effect and less conscientious individuals were at increased risk of masked uncontrolled hypertension. Particularly among anxious and less conscientious individuals, ambulatory monitoring may improve the tailoring of pharmacological treatments. PMID:25186529

  2. Determining the Critcial Size of EUV Mask Substrate Defects

    Energy Technology Data Exchange (ETDEWEB)

    Mccall, Monnikue M; Han, Hakseung; Cho, Wonil; Goldberg, Kenneth; Gullikson, Eric; Jeon, Chan-Uk; Wurm, Stefan

    2008-02-28

    Determining the printability of substrate defects beneath the extreme ultraviolet (EUV) reflecting multilayer stack is an important issue in EUVL lithography. Several simulation studies have been performed in the past to determine the tolerable defect size on EUV mask blank substrates but the industry still has no exact specification based on real printability tests. Therefore, it is imperative to experimentally determine the printability of small defects on a mask blanks that are caused by substrate defects using direct printing of programmed substrate defect in an EUV exposure tool. SEMATECH fabricated bump type program defect masks using standard electron beam lithography and performed printing tests with the masks using an EUV exposure tool. Defect images were also captured using SEMATECH's Berkeley Actinic Imaging Tool in order to compare aerial defect images with secondary electron microscope images from exposed wafers. In this paper, a comprehensive understanding of substrate defect printability will be presented and printability specifications of EUV mask substrate defects will be discussed.

  3. Determining the critical size of EUV mask substrate defects

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Gullikson, Eric M.; Han, Hakseung; Cho, Wonil; Jeon, Chan-Uk; Wurm, Stefan

    2008-05-26

    Determining the printability of substrate defects beneath the extreme ultraviolet (EUV) reflecting multilayer stack is an important issue in EUVL lithography. Several simulation studies have been performed in the past to determine the tolerable defect size on EUV mask blank substrates but the industry still has no exact specification based on real printability tests. Therefore, it is imperative to experimentally determine the printability of small defects on a mask blanks that are caused by substrate defects using direct printing of programmed substrate defect in an EUV exposure tools. SEMATECH fabricated bump type program defect masks using standard electron beam lithography and performed printing tests with the masks using an EUV exposure tool. Defect images were also captured using SEMATECH's Berkeley Actinic Imaging Tool in order to compare aerial defect images with secondary electron microscope images from exposed wafers. In this paper, a comprehensive understanding of substrate defect printability will be presented and printability specifications of EUV mask substrate defects will be discussed.

  4. Flexible fabrication of multi-scale integrated 3D periodic nanostructures with phase mask

    Science.gov (United States)

    Yuan, Liang Leon

    Top-down fabrication of artificial nanostructures, especially three-dimensional (3D) periodic nanostructures, that forms uniform and defect-free structures over large area with the advantages of high throughput and rapid processing and in a manner that can further monolithically integrate into multi-scale and multi-functional devices is long-desired but remains a considerable challenge. This thesis study advances diffractive optical element (DOE) based 3D laser holographic nanofabrication of 3D periodic nanostructures and develops new kinds of DOEs for advanced diffracted-beam control during the fabrication. Phase masks, as one particular kind of DOE, are a promising direction for simple and rapid fabrication of 3D periodic nanostructures by means of Fresnel diffraction interference lithography. When incident with a coherent beam of light, a suitable phase mask (e.g. with 2D nano-grating) can create multiple diffraction orders that are inherently phase-locked and overlap to form a 3D light interference pattern in the proximity of the DOE. This light pattern is typically recorded in photosensitive materials including photoresist to develop into 3D photonic crystal nanostructure templates. Two kinds of advanced phase masks were developed that enable delicate phase control of multiple diffraction beams. The first exploits femtosecond laser direct writing inside fused silica to assemble multiple (up to nine) orthogonally crossed (2D) grating layers, spaced on Talbot planes to overcome the inherent weak diffraction efficiency otherwise found in low-contrast volume gratings. A systematic offsetting of orthogonal grating layers to establish phase offsets over 0 to pi/2 range provided precise means for controlling the 3D photonic crystal structure symmetry between body centered tetragonal (BCT) and woodpile-like tetragonal (wTTR). The second phase mask consisted of two-layered nanogratings with small sub-wavelength grating periods and phase offset control. That was

  5. Water ice and sub-micron ice particles on Tethys and Mimas

    Science.gov (United States)

    Scipioni, Francesca; Nordheim, Tom; Clark, Roger Nelson; D'Aversa, Emiliano; Cruikshank, Dale P.; Tosi, Federico; Schenk, Paul M.; Combe, Jean-Philippe; Dalle Ore, Cristina M.

    2017-10-01

    IntroductionWe present our ongoing work, mapping the variation of the main water ice absorption bands, and the distribution of the sub-micron particles, across Mimas and Tethys’ surfaces using Cassini-VIMS cubes acquired in the IR range (0.8-5.1 μm). We present our results in the form of maps of variation of selected spectral indicators (depth of absorption bands, reflectance peak height, spectral slopes).Data analysisVIMS acquires hyperspectral data in the 0.3-5.1 μm spectral range. We selected VIMS cubes of Tethys and Mimas in the IR range (0.8-5.1 μm). For all pixels in the selected cubes, we measured the band depths for water-ice absorptions at 1.25, 1.5 and 2.02 μm and the height of the 3.6 μm reflection peak. Moreover, we considered the spectral indictors for particles smaller than 1 µm [1]: (i) the 2 µm absorption band is asymmetric and (ii) it has the minimum shifted to longer λ (iii) the band depth ratio 1.5/2.0 µm decreases; (iv) the reflection peak at 2.6 µm decreases; (v) the Fresnel reflection peak is suppressed; (vi) the 5 µm reflectance is decreased relative to the 3.6 µm peak. To characterize the global variation of water-ice band depths, and of sub-micron particles spectral indicators, across Mimas and Tethys, we sampled the two satellites’ surfacees with a 1°x1° fixed-resolution grid and then averaged the band depths and peak values inside each square cell.3. ResultsFor both moons we find that large geologic features, such as the Odysseus and Herschel impact basins, do not correlate with water ice’s abundance variation. For Tethys, we found a quite uniform surface on both hemispheres. The only deviation from this pattern shows up on the trailing hemisphere, where we notice two north-oriented, dark areas around 225° and 315°. For Mimas, the leading and trailing hemispheres appear to be quite similar in water ice abundance, the trailing portion having water ice absorption bands lightly more suppressed than the leading side

  6. Sub-micron resolution high-speed spectral domain optical coherence tomography in quality inspection for printed electronics

    Science.gov (United States)

    Czajkowski, J.; Lauri, J.; Sliz, R.; Fält, P.; Fabritius, T.; Myllylä, R.; Cense, B.

    2012-04-01

    We present the use of sub-micron resolution optical coherence tomography (OCT) in quality inspection for printed electronics. The device used in the study is based on a supercontinuum light source, Michelson interferometer and high-speed spectrometer. The spectrometer in the presented spectral-domain optical coherence tomography setup (SD-OCT) is centered at 600 nm and covers a 400 nm wide spectral region ranging from 400 nm to 800 nm. Spectra were acquired at a continuous rate of 140,000 per second. The full width at half maximum of the point spread function obtained from a Parylene C sample was 0:98 m. In addition to Parylene C layers, the applicability of sub-micron SD-OCT in printed electronics was studied using PET and epoxy covered solar cell, a printed RFID antenna and a screen-printed battery electrode. A commercial SD-OCT system was used for reference measurements.

  7. The Character Adaptation of Masked Puppet Figures in Ruwatan Ritual

    Directory of Open Access Journals (Sweden)

    Robby Hidajat

    2016-12-01

    Full Text Available One myth that is believed by people living in Duwet village is distress that threatens human beings from when they are born till the day they die. As one way to overcome the distress, people, especially those who are living in Duwet village, hold ritual called as tolak bala. One step in the ritual is self-cleaning oneself from distress or sukerta. In addition to the ritual is a masked puppet as a means of the ritual execution. Thus, this study aims at finding out the functions of the Ruwatan masked puppet. Functional-structural perspective was adopted in the study by implementing observation, interview, and documentation study techniques. Results show that masked puppet has a special function which is to serve as a means of Ruwatan that is specifically to obtain society participation in order to give spiritual support to the process of ritual as a whole tolak bala or distress expulsion process.

  8. Clay facial masks: physicochemical stability at different storage temperatures.

    Science.gov (United States)

    Zague, Vivian; de Almeida Silva, Diego; Baby, André Rolim; Kaneko, Telma Mary; Velasco, Maria Valéria Robles

    2007-01-01

    Clay facial masks--formulations that contain a high percentage of solids dispersed in a liquid vehicle--have become of special interest due to specific properties presented by clays, such as particle size, cooling index, high adsorption capacity, and plasticity. Although most of the physicochemical properties of clay dispersions have been studied, specific aspects concerning the physicochemical stability of clay mask products remain unclear. This work aimed at investigating the accelerated physicochemical stability of clay mask formulations stored at different temperatures. Formulations were subjected to centrifuge testing and to thermal treatment for 15 days, during which temperature was varied from -5.0 degrees to 45.0 degrees C. The apparent viscosity and visual aspect (homogeneity) of all formulations were affected by temperature variation, whereas color, odor, and pH value remained unaltered. These results, besides the estimation of physicochemical stability under aging, can be useful in determining the best storage conditions for clay-based formulations.

  9. Emotional conditioning to masked stimuli and modulation of visuospatial attention.

    Science.gov (United States)

    Beaver, John D; Mogg, Karin; Bradley, Brendan P

    2005-03-01

    Two studies investigated the effects of conditioning to masked stimuli on visuospatial attention. During the conditioning phase, masked snakes and spiders were paired with a burst of white noise, or paired with an innocuous tone, in the conditioned stimulus (CS)+ and CS- conditions, respectively. Attentional allocation to the CSs was then assessed with a visual probe task, in which the CSs were presented unmasked (Experiment 1) or both unmasked and masked (Experiment 2), together with fear-irrelevant control stimuli (flowers and mushrooms). In Experiment 1, participants preferentially allocated attention to CS+ relative to control stimuli. Experiment 2 suggested that this attentional bias depended on the perceived aversiveness of the unconditioned stimulus and did not require conscious recognition of the CSs during both acquisition and expression. Copyright 2005 APA, all rights reserved.

  10. Classification and printability of EUV mask defects from SEM images

    Science.gov (United States)

    Cho, Wonil; Price, Daniel; Morgan, Paul A.; Rost, Daniel; Satake, Masaki; Tolani, Vikram L.

    2017-10-01

    Classification and Printability of EUV Mask Defects from SEM images EUV lithography is starting to show more promise for patterning some critical layers at 5nm technology node and beyond. However, there still are many key technical obstacles to overcome before bringing EUV Lithography into high volume manufacturing (HVM). One of the greatest obstacles is manufacturing defect-free masks. For pattern defect inspections in the mask-shop, cutting-edge 193nm optical inspection tools have been used so far due to lacking any e-beam mask inspection (EBMI) or EUV actinic pattern inspection (API) tools. The main issue with current 193nm inspection tools is the limited resolution for mask dimensions targeted for EUV patterning. The theoretical resolution limit for 193nm mask inspection tools is about 60nm HP on masks, which means that main feature sizes on EUV masks will be well beyond the practical resolution of 193nm inspection tools. Nevertheless, 193nm inspection tools with various illumination conditions that maximize defect sensitivity and/or main-pattern modulation are being explored for initial EUV defect detection. Due to the generally low signal-to-noise in the 193nm inspection imaging at EUV patterning dimensions, these inspections often result in hundreds and thousands of defects which then need to be accurately reviewed and dispositioned. Manually reviewing each defect is difficult due to poor resolution. In addition, the lack of a reliable aerial dispositioning system makes it very challenging to disposition for printability. In this paper, we present the use of SEM images of EUV masks for higher resolution review and disposition of defects. In this approach, most of the defects detected by the 193nm inspection tools are first imaged on a mask SEM tool. These images together with the corresponding post-OPC design clips are provided to KLA-Tencor's Reticle Decision Center (RDC) platform which provides ADC (Automated Defect Classification) and S2A (SEM

  11. Influence of binary mask estimation errors on robust speaker identification

    DEFF Research Database (Denmark)

    May, Tobias

    2017-01-01

    and unreliable feature components in the context of automatic speaker identification (SID). A systematic evaluation under ideal and non-ideal conditions demonstrated that the robustness to errors in the binary mask varied substantially across the different missing-data strategies. Moreover, full and bounded......Missing-data strategies have been developed to improve the noise-robustness of automatic speech recognition systems in adverse acoustic conditions. This is achieved by classifying time-frequency (T-F) units into reliable and unreliable components, as indicated by a so-called binary mask. Different....... Since each of these approaches utilizes the knowledge about reliable and unreliable feature components in a different way, they will respond differently to estimation errors in the binary mask. The goal of this study was to identify the most effective strategy to exploit knowledge about reliable...

  12. EUV mask reflectivity measurements with micro-scale spatial resolution

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Rekawa, Senajith B.; Kemp, Charles D.; Barty, Anton; Anderson, Erik; Kearney, Patrick; Han, Hakseung

    2008-02-01

    The effort to produce defect-free mask blanks for EUV lithography relies on increasing the detection sensitivity of advanced mask inspection tools, operating at several wavelengths. They describe the unique measurement capabilities of a prototype actinic (EUV) wavelength microscope that is capable of detecting small defects and reflectivity changes that occur on the scale of microns to nanometers. The defects present in EUV masks can appear in many well-known forms: as particles that cause amplitude or phase variations in the reflected field; as surface contamination that reduces reflectivity and contrast; and as damage from inspection and use that reduces the reflectivity of the multilayer coating. This paper presents an overview of several topics where scanning actinic inspection makes a unique contribution to EUVL research. They describe the role of actinic scanning inspection in defect repair studies, observations of laser damage, actinic inspection following scanning electron microscopy, and the detection of both native and programmed defects.

  13. LMS IPRO: enabling accurate registration metrology on SiN-based phase-shift masks

    Science.gov (United States)

    Steigerwald, Hendrik; Han, Runyuan; Buettner, Alexander; Roeth, Klaus-Dieter

    2017-07-01

    SiN-based absorber materials are considered to be the new work horse for cutting-edge patterning using 193-nm immersion lithography. The high robustness against cleaning procedures and the low susceptibility for haze makes SiN an ideal material for phase-shift masks. Reliable metrology with high precision, on target as well as on feature, is enabled by the LMS IPROTM metrology tool. This is achieved by taking into account the optical properties of the novel materials and utilisation of the high-accuracy die-to-database algorithm. Simulation as well as actual measurement results are presented. Cost effectiveness of the LMS IPRO is demonstrated by comparison of high-performance mode results versus high-throughput results, confirming suitable metrology performance for high-volume manufacturing.

  14. Etch bias inversion during EUV mask ARC etch

    Science.gov (United States)

    Lajn, Alexander; Rolff, Haiko; Wistrom, Richard

    2017-07-01

    The introduction of EUV lithography to high volume manufacturing is now within reach for 7nm technology node and beyond (1), at least for some steps. The scheduling is in transition from long to mid-term. Thus, all contributors need to focus their efforts on the production requirements. For the photo mask industry, these requirements include the control of defectivity, CD performance and lifetime of their masks. The mask CD performance including CD uniformity, CD targeting, and CD linearity/ resolution, is predominantly determined by the photo resist performance and by the litho and etch processes. State-of-the-art chemically amplified resists exhibit an asymmetric resolution for directly and indirectly written features, which usually results in a similarly asymmetric resolution performance on the mask. This resolution gap may reach as high as multiple tens of nanometers on the mask level in dependence of the chosen processes. Depending on the printing requirements of the wafer process, a reduction or even an increase of this gap may be required. A potential way of tuning via the etch process, is to control the lateral CD contribution during etch. Aside from process tuning knobs like pressure, RF powers and gases, which usually also affect CD linearity and CD uniformity, the simplest knob is the etch time itself. An increased over etch time results in an increased CD contribution in the normal case. , We found that the etch CD contribution of ARC layer etch on EUV photo masks is reduced by longer over etch times. Moreover, this effect can be demonstrated to be present for different etch chambers and photo resists.

  15. Designing to win in sub-90nm mask production

    Science.gov (United States)

    Zhang, Yuan

    2005-11-01

    An informal survey conducted with key customers by Photronics indicates that the time gap between technology nodes has accelerated in recent years. Previously the cycle was three years. However, between 130nm and 90nm there was less than a 2 year gap, and between 90nm and 65nm a 1.5 year gap exists. As a result, the technical challenges have increased substantially. In addition, mask costs are rising exponentially due to high capital equipment cost, a shrinking customer base, long write times and increased applications of 193nm EAPSM or AAPSM. Collaboration among EDA companies, mask houses and wafer manufacturers is now more important than ever. This paper will explore avenues for reducing mask costs, mainly in the areas of: write-time reduction through design for manufacturing (DFM), and yield improvement through specification relaxation. Our study conducted through layout vertex modeling suggests that a simple design shape such as a square versus a circle or an angled structure helps reduce shot count and write time. Shot count reduction through mask layout optimization, and advancement in new generation E-beam writers can reduce write time up to 65%. An advanced laser writer can produce those less critical E-beam layers in less than half the time of an e-beam writer. Additionally, the emerging imprint lithography brings new life and new challenges to the photomask industry with applications in many fields outside of the semiconductor industry. As immersion lithography is introduced for 45nm device production, polarization and MEEF effects due to the mask will become severe. Larger magnification not only provides benefits on CD control and MEEF, but also extends the life time of current 90nm/65nm tool sets where 45nm mask sets can be produced at a lower cost.

  16. Fate of Multimeric Oligomers, Submicron, and Micron Size Aggregates of Monoclonal Antibodies Upon Subcutaneous Injection in Mice.

    Science.gov (United States)

    Kijanka, Grzegorz; Bee, Jared S; Bishop, Steven M; Que, Ivo; Löwik, Clemens; Jiskoot, Wim

    2016-05-01

    The aim of this study was to examine the fate of differently sized protein aggregates upon subcutaneous injection in mice. A murine and a human monoclonal immunoglobulin G 1 (IgG1) antibody were labeled with a fluorescent dye and subjected to stress conditions to create aggregates. Aggregates fractionated by centrifugation or gel permeation chromatography were administered subcutaneously into SKH1 mice. The biodistribution was measured by in vivo fluorescence imaging for up to 1 week post injection. At several time points, mice were sacrificed and selected organs and tissues were collected for ex vivo analysis. Part of injected aggregated IgGs persisted much longer at the injection site than unstressed controls. Aggregate fractions containing submicron (0.1-1 μm) or micron (1-100 μm) particles were retained to a similar extent. Highly fluorescent "hot-spots" were detected 24 h post injection in spleens of mice injected with submicron aggregates of murine IgG. Submicron aggregates of human IgG showed higher accumulation in draining lymph nodes 1 h post injection than unstressed controls or micron size aggregates. For both tested proteins, aggregated fractions seemed to be eliminated from circulation more rapidly than monomeric fractions. The biodistribution of monomers isolated from solutions subjected to stress conditions was similar to that of unstressed control. Copyright © 2016 American Pharmacists Association®. Published by Elsevier Inc. All rights reserved.

  17. MODELING SPECTRAL AND TEMPORAL MASKING IN THE HUMAN AUDITORY SYSTEM

    DEFF Research Database (Denmark)

    Dau, Torsten; Jepsen, Morten Løve; Ewert, Stephan D.

    2007-01-01

    An auditory signal processing model is presented that simulates psychoacoustical data from a large variety of experimental conditions related to spectral and temporal masking. The model is based on the modulation filterbank model by Dau et al. [J. Acoust. Soc. Am. 102, 2892-2905 (1997)] but inclu......An auditory signal processing model is presented that simulates psychoacoustical data from a large variety of experimental conditions related to spectral and temporal masking. The model is based on the modulation filterbank model by Dau et al. [J. Acoust. Soc. Am. 102, 2892-2905 (1997...

  18. MARIJ KOGOJ SKOZI OPERO ČRNE MASKE

    OpenAIRE

    Molan, Tadeja

    2014-01-01

    Diplomska naloga v uvodu predstavi primarno družino Marija Kogoja, njegovo odraščanje, prva srečanja z glasbo v domačem kraju ter nadaljnja izobraževanja v Gorici, Ljubljani in kasneje na Dunaju. Pred osrednjim delom naloge je dokaj obširno opredeljena glasbena situacija na Slovenskem v začetku 20. stoletja. Bistveni del se nanaša na dramo Črne maske Leonida Nikolajeviča Andrejeva, na podlagi katere Kogoj napiše svojo mojstrovino, opero Črne maske. Poudarek je na analizi vsebine, uprizori...

  19. Image masking using polygon fills and morphological transformations

    Science.gov (United States)

    Simpson, James J.

    1992-01-01

    Polygon-fill operations and morphological transformations are effective computational tools for the land-masking and coastline-correction preprocessing operations often applied to AVHRR data prior to oceanographic applications. These masking operations, in conjunction with cloud-screening techniques, can be used on such other oceanographically significant remote-sensing data as those of the Coastal Zone Color Scanner, GOES, and Landsat. The sensitivity of the methods to regional variations in atmospheric conditions and land-ocean temperature gradients is assessed for tropical, midlatitude, and high latitude regions.

  20. Environment-aware ideal binary mask estimation using monaural cues

    DEFF Research Database (Denmark)

    May, Tobias; Dau, Torsten

    2013-01-01

    We present a monaural approach to speech segregation that estimates the ideal binary mask (IBM) by combining amplitude modulation spectrogram (AMS) features, pitch-based features and speech presence probability (SPP) features derived from noise statistics. To maintain a high mask estimation...... accuracy in the presence of various background noises, the system employs environment-specific segregation models and automatically selects the appropriate model for a given input signal. Furthermore, instead of classifying each timefrequency (T-F) unit independently, the a posteriori probabilities...... of speech and noise presence are evaluated by considering adjacent TF units. The proposed system achieves high classification accuracy....

  1. Comparison of trapezius squeeze test and jaw thrust as clinical indicators for laryngeal mask airway insertion in spontaneously breathing children

    OpenAIRE

    K K Dinesh Kumar; Neerja Bhardwaj; Sandhya Yaddanapudi

    2017-01-01

    Background and Aims: It is not known whether trapezius squeeze test (TPZ) is a better clinical test than jaw thrust (JT) to assess laryngeal mask airway (LMA) insertion conditions in children under sevoflurane anesthesia. Material and Methods: After the Institutional Ethics Committee approval and written informed parental consent, 124 American Society of Anesthesiologists I and II children of 2?8 years of age undergoing minor surgical procedures were randomized into TPZ and JT groups. The chi...

  2. Selective nanoscale growth of lattice mismatched materials

    Energy Technology Data Exchange (ETDEWEB)

    Lee, Seung-Chang; Brueck, Steven R. J.

    2017-06-20

    Exemplary embodiments provide materials and methods of forming high-quality semiconductor devices using lattice-mismatched materials. In one embodiment, a composite film including one or more substantially-single-particle-thick nanoparticle layers can be deposited over a substrate as a nanoscale selective growth mask for epitaxially growing lattice-mismatched materials over the substrate.

  3. FY 2000 Industrial science and technology research and development themes - cooperative project with academic circles. Report on the results of research and development of technologies for creating new bioaffinity molecules using submicron beads (Development of technologies for rational use of energy); 2000 nendo biryushi riyogata seitai ketsugo busshitsu nado sosei gijutsu no kenkyu kaihatsu seika hokokusho. Energy shiyo gorika gijutsu kaihatsu

    Energy Technology Data Exchange (ETDEWEB)

    NONE

    2001-03-01

    Described herein are the FY 2000 results of the research and development for creating new bioaffinity molecules using submicron beads. The program for development of technology for analyzing chemical-biomolecule complexes using submicron affinity beads has developed a detachable linker which allows the complex, composed of ligand on the affinity latex particle surfaces and receptor bound thereto, to be detached directly from the particles, and also developed the prototype of magnetite-containing polymer particles with a diameter of submicron order, which facilitate recovery of the affinity latex. The program for development of technology to create chemical substances with new functions has successfully constructed the focused library composed of 400 compounds based on the split and pool method for FR225659 as a glucose modulator, chosen as the target material. It also has established the method of synthesizing opioid alkaloid as the target compound on the solid phase, and synthesized 39 opioid compounds with condensed indol rings, having diverse of several substituents. (NEDO)

  4. Spectral photosensitivity of an organic semiconductor in a submicron metal grating

    Energy Technology Data Exchange (ETDEWEB)

    Blinov, L. M., E-mail: lev39blinov@gmail.com; Lazarev, V. V.; Yudin, S. G.; Palto, S. P. [Russian Academy of Sciences, Shubnikov Institute of Crystallography (Russian Federation)

    2016-02-15

    The photoelectric effect in films of the copper phthalocyanine organic semiconductor (α-CuPc) has been experimentally studied for two fundamentally different geometries. A sample in the first, normal geometry is fabricated in the form of a sandwich with an α-CuPc film between a transparent SnO{sub 2} electrode on a substrate and an upper reflecting Al electrode. In the second case of the planar geometry, the semiconductor is deposited on the substrate with a system of submicron chromium interdigital electrodes. It has been found that the effective photoconductivity in the planar geometry is more than two orders of magnitude higher than that in the normal geometry. In addition to the classical model (without excitons), a simple exciton model has been proposed within which a relation has been obtained between the probability of the formation of electron–hole pairs and the characteristic recombination and dissociation times of excitons. An increase in the photoconductivity in the planar geometry has been explained within the exciton model by an increase in the rate of dissociation of excitons into electron–hole pairs owing to acceptor oxygen molecules, which diffuse more efficiently into the film in the case of the planar geometry where the upper electrode is absent.

  5. Low density lipoprotein peptide conjugated submicron emulsions for combating prostate cancer.

    Science.gov (United States)

    Sun, Pengchao; Zhang, Nan; Hua, Haiying; Liang, Qian; Zhang, Xuexiao; Sun, Qian; Zhao, Yongxing

    2017-02-01

    Submicron emulsions (SEs) is an advanced formulation that possesses good biocompatibility, high loading of hydrophobic drugs, and good stability through autoclave sterilization. To enhance tumor targeting and tumor cell uptake, SEs could be modified with positive charge and targeting moieties. In the present study, three formulations were prepared: Docetaxel-loaded SEs (DocSEs), cationic DocSEs (DocCSEs), and low density lipoprotein receptor (LDLR) targeted peptide-RLT (CEKLKEAFRLTRKRGLKLA) modified DocCSEs (RLT-DocCSEs). The optimized RLT-DocCSEs showed a particle size 182.2±10nm, a zeta potential 39.62±2.41mV, and a loading efficiency of Docetaxel (Doc) 98%. RLT-DocCSEs demonstrated sustained release in 96h and was stable for two months at 4°C. Compared to DocSEs and DocCSEs, RLT-DocCSEs caused significantly more PC-3 cell inhibition and cell apoptosis. RLT-DocCSEs also showed more cellular uptake and slower cellular elimination than that of DocSEs and DocCSEs. The present study indicated RLT-DocCSEs could be a potential formulation for injection of anti-cancer therapeutics with increased tumor targeting and anti-tumor efficacy. Copyright © 2016 Elsevier Masson SAS. All rights reserved.

  6. Pharmacokinetics, tissue distribution and anti-tumor effect of low density lipoprotein peptide conjugated submicron emulsions.

    Science.gov (United States)

    Zhang, Nan; Miao, Jinhong; Sun, Pengchao; Liang, Qian; Hua, Haiying; Xu, Yusheng; Zhao, Yongxing

    2016-08-01

    Docetaxel (Doc) is a potent chemotherapy for cancer but its application is limited by poor water solubility and high risk of side effects. To improve these issues, low density lipoprotein receptor (LDLR) targeted peptide-RLT (CEKLKEAFRLTRKRGLKLA) modified Docetaxel-loaded submicron emulsions (RLT-DocSEs) had been developed. Docetaxel-loaded SEs (DocSEs) and cationic DocSEs (DocCSEs) were also prepared for comparison. To evaluate the tumor-targeting ability and anti-tumor efficacy, DocSEs, DocCSEs, and RLT-DocSEs were administrated intravenously to rats respectively. The pharmacokinetic parameters of three formulations were significantly different. In vivo distribution study was conducted in mice and the results indicated that RLT-DocSEs possessed increased tumor targeting ability than DocSEs and DocCSEs. RLT-DocSEs also resulted in a higher tumor inhibition rate and a better anti-tumor efficacy in mice. All the results suggested that RLT-DocSEs could be a potential formulation for the injection of Doc with enhanced tumor targeting and anti-tumor efficacy. Copyright © 2016 Elsevier Masson SAS. All rights reserved.

  7. Cefquinome Controlled Size Submicron Particles Precipitation by SEDS Process Using Annular Gap Nozzle

    Directory of Open Access Journals (Sweden)

    Kefeng Xiao

    2017-01-01

    Full Text Available An annular gap nozzle was applied in solution enhanced dispersion by supercritical fluids (SEDS process to prepare cefquinome controlled size submicron particles so as to enhance their efficacy. Analysis results of orthogonal experiments indicated that the concentration of solution was the primary factor to affect particle sizes in SEDS process, and feeding speed of solution, precipitation pressure, and precipitation temperature ranked second to fourth. Meanwhile, the optimal operating conditions were that solution concentration was 100 mg/mL, feeding speed was 9 mL/min, precipitation pressure was 10 MPa, and precipitation temperature was 316 K. The confirmatory experiment showed that D50 of processed cefquinome particles in optimal operating conditions was 0.73 μm. Moreover, univariate effect analysis showed that the cefquinome particle size increased with the increase of concentration of the solution or precipitation pressure but decreased with the increase of solution feeding speed. When precipitation temperature increased, the cefquinome particle size showed highest point. Moreover, characterization of processed cefquinome particles was analyzed by SEM, FT-IR, and XRD. Analysis results indicated that the surface appearance of processed cefquinome particles was flakes. The chemical structure of processed cefquinome particles was not changed, and the crystallinity of processed cefquinome particles was a little lower than that of raw cefquinome particles.

  8. Synthesis of gelatin nano/submicron particles by binary nonsolvent aided coacervation (BNAC) method.

    Science.gov (United States)

    Patra, Shamayita; Basak, Piyali; Tibarewala, D N

    2016-02-01

    A newly developed modified coacervation method is utilized to synthesize gelatin nano/submicron particles (GN/SPs) as a drug carrier. Binary nonsolvent aided coacervation (BNAC) method is a modified single step coacervation method, which has yielded approximately a threefold lower particle size and higher average yield in terms of weight percentage of around 94% in comparison to the conventional phase separation methods. In this study 0.5% (w/v) gelatin aqueous solution with a binary nonsolvent system of acetone and ethanol was used. Nanoparticle synthesis was optimized with respect to nonsolvent system type and pH. pH7 has resulted a minimum particle size of 55.67 (±43.74) nm in anhydrous medium along with a swollen particle size of 776nm (±38.57) in aqueous medium with a zeta potential of (-16.3±3.51) mV in aqueous medium. Swelling ratio of 13.95 confirms the crosslinked hydrogel nature of the particles. Furthermore, drug loading efficiency of the gelatin particles prepared at 7pH was observed with nitrofurazone as the model drug. Results of drug release study indicate the potential use of GN/SPs as drug loading matrix for wound management such as burn wound management. Copyright © 2015 Elsevier B.V. All rights reserved.

  9. Sub-micron Hard X-ray Fluorescence Imaging of Synthetic Elements

    Science.gov (United States)

    Jensen, Mark P.; Aryal, Baikuntha P.; Gorman-Lewis, Drew; Paunesku, Tatjana; Lai, Barry; Vogt, Stefan; Woloschak, Gayle E.

    2013-01-01

    Synchrotron-based X-ray fluorescence microscopy (SXFM) using hard X-rays focused into sub-micron spots is a powerful technique for elemental quantification and mapping, as well as microspectroscopic measurement such as μ-XANES (X-ray absorption near edge structure). We have used SXFM to image and simultaneously quantify the transuranic element plutonium at the L3 or L2 edge as well as lighter biologically essential elements in individual rat pheochromocytoma (PC12) cells after exposure to the long-lived plutonium isotope 242Pu. Elemental maps reveal that plutonium localizes principally in the cytoplasm of the cells and avoids the cell nucleus, which is marked by the highest concentrations of phosphorus and zinc, under the conditions of our experiments. The minimum detection limit under typical acquisition conditions for an average 202 μm2 cell is 1.4 fg Pu/cell or 2.9 × 10−20 moles Pu/μm2, which is similar to the detection limit of K-edge SXFM of transition metals at 10 keV. Copper electron microscopy grids were used to avoid interference from gold X-ray emissions, but traces of strontium present in naturally occurring calcium can still interfere with plutonium detection using its Lα X-ray emission. PMID:22444530

  10. Mechanically Robust, Stretchable Solar Absorbers with Submicron-Thick Multilayer Sheets for Wearable and Energy Applications.

    Science.gov (United States)

    Lee, Hye Jin; Jung, Dae-Han; Kil, Tae-Hyeon; Kim, Sang Hyeon; Lee, Ki-Suk; Baek, Seung-Hyub; Choi, Won Jun; Baik, Jeong Min

    2017-05-31

    A facile method to fabricate a mechanically robust, stretchable solar absorber for stretchable heat generation and an enhanced thermoelectric generator (TEG) is demonstrated. This strategy is very simple: it uses a multilayer film made of titanium and magnesium fluoride optimized by a two-dimensional finite element frequency-domain simulation, followed by the application of mechanical stresses such as bending and stretching to the film. This process produces many microsized sheets with submicron thickness (∼500 nm), showing great adhesion to any substrates such as fabrics and polydimethylsiloxane. It exhibits a quite high light absorption of approximately 85% over a wavelength range of 0.2-4.0 μm. Under 1 sun illumination, the solar absorber on various stretchable substrates increased the substrate temperature to approximately 60 °C, irrespective of various mechanical stresses such as bending, stretching, rubbing, and even washing. The TEG with the absorber on the top surface also showed an enhanced output power of 60%, compared with that without the absorber. With an incident solar radiation flux of 38.3 kW/m 2 , the output power significantly increased to 24 mW/cm 2 because of the increase in the surface temperature to 141 °C.

  11. Chemical compositions, sources and evolution processes of the submicron aerosols in Nanjing, China during wintertime

    Science.gov (United States)

    Wu, Y.; He, Y.; Ge, X.; Wang, J.; Yu, H.; Chen, M.

    2016-12-01

    Elevated atmospheric particulate matter pollution is one of the most significant environmental issues in the Yangtze River Delta (YRD), China. Thus it is important to unravel the characteristics, sources and evolution processes of the ambient aerosols in order to improve the air quality. In this study, we report the real-time monitoring results on submicron aerosol particles (PM1) in suburban Nanjing during wintertime of 2015, using an Aerodyne soot particle aerosol mass spectrometer (SP-AMS). This instrument allows the fast measurement of refractory black carbon simultaneously with other aerosol components. Results show that organics was on average the most abundant species of PM1 (25.9%), but other inorganic species, such as nitrate (23.7%) and sulfate (23.3%) also comprised large mass fractions. As the sampling site is heavily influenced by various sources including industrial, traffic and other anthropogenic emissions, etc., six organic aerosol (OA) factors were identified from Positive matrix factorization (PMF) analysis of the SP-AMS OA mass spectra. These factors include three primary OA factors - a hydrocarbon-like OA, an industry-related OA (IOA) and a cooking OA (COA), and three secondary OA factors, i.e., a local OOA (LSOA), a semi-volatile OOA (SV-OOA) and a low-volatility OOA (LV-OOA). Overall, the primary organic aerosol (POA) (HOA, IOA and COA) dominated the total OA mass. Behaviors and evolution processes of these OA factors will be discussed in combining with the other supporting data.

  12. A new circuit technique for reduced leakage current in Deep Submicron CMOS technologies

    Directory of Open Access Journals (Sweden)

    A. Schmitz

    2005-01-01

    Full Text Available Modern CMOS processes in the Deep Submicron regime are restricted to supply voltages below 2 volts and further to account for the transistors' field strength limitations and to reduce the power per logic gate. To maintain the high switching performance, the threshold voltage must be scaled according with the supply voltage. However, this leads to an increased subthreshold current of the transistors in standby mode (VGS=0. Another source of leakage is gate current, which becomes significant for gate oxides of 3nm and below. We propose a Self-Biasing Virtual Rails (SBVR - CMOS technique which acts like an adaptive local supply voltage in case of standby mode. Most important sources of leakage currents are reduced by this technique. Moreover, SBVR-CMOS is capable of conserving stored information in sleep mode, which is vital for memory circuits. Memories are exposed to radiation causing soft errors. This well-known problem becomes even worse in standby mode of typical SRAMs, that have low driving performance to withstand alpha particle hits. In this paper, a 16-transistor SRAM cell is proposed, which combines the advantage of extremely low leakage currents with a very high soft error stability.

  13. Immunogenicity Studies of Bivalent Inactivated Virions of EV71/CVA16 Formulated with Submicron Emulsion Systems

    Directory of Open Access Journals (Sweden)

    Chih-Wei Lin

    2014-01-01

    Full Text Available We assessed two strategies for preparing candidate vaccines against hand, foot, and mouth disease (HFMD caused mainly by infections of enterovirus (EV 71 and coxsackievirus (CV A16. We firstly design and optimize the potency of adjuvant combinations of emulsion-based delivery systems, using EV71 candidate vaccine as a model. We then perform immunogenicity studies in mice of EV71/CVA16 antigen combinations formulated with PELC/CpG. A single dose of inactivated EV71 virion (0.2 μg emulsified in submicron particles was found (i to induce potent antigen-specific neutralizing antibody responses and (ii consistently to elicit broad antibody responses against EV71 neutralization epitopes. A single dose immunogenicity study of bivalent activated EV71/CVA16 virion formulated with either Alum or PELC/CpG adjuvant showed that CVA16 antigen failed to elicit CVA16 neutralizing antibody responses and did not affect EV71-specific neutralizing antibody responses. A boosting dose of emulsified EV71/CVA16 bivalent vaccine candidate was found to be necessary to achieve high seroconversion of CVA16-specific neutralizing antibody responses. The current results are important for the design and development of prophylactic vaccines against HFMD and other emerging infectious diseases.

  14. Quantitative cellular uptake of double fluorescent core-shelled model submicronic particles

    Energy Technology Data Exchange (ETDEWEB)

    Leclerc, Lara, E-mail: leclerc@emse.fr [Ecole Nationale Superieure des Mines, CIS-EMSE, LINA (France); Boudard, Delphine [LINA (France); Pourchez, Jeremie; Forest, Valerie [Ecole Nationale Superieure des Mines, CIS-EMSE, LINA (France); Marmuse, Laurence; Louis, Cedric [NANO-H S.A.S (France); Bin, Valerie [LINA (France); Palle, Sabine [Universite Jean Monnet, Centre de Microscopie Confocale Multiphotonique (France); Grosseau, Philippe; Bernache-Assollant, Didier [Ecole Nationale Superieure des Mines, CIS-EMSE, LINA (France); Cottier, Michele [LINA (France)

    2012-11-15

    The relationship between particles' physicochemical parameters, their uptake by cells and their degree of biological toxicity represent a crucial issue, especially for the development of new technologies such as fabrication of micro- and nanoparticles in the promising field of drug delivery systems. This work was aimed at developing a proof-of-concept for a novel model of double fluorescence submicronic particles that could be spotted inside phagolysosomes. Fluorescein isothiocyanate (FITC) particles were synthesized and then conjugated with a fluorescent pHrodo Trade-Mark-Sign probe, red fluorescence of which increases in acidic conditions such as within lysosomes. After validation in acellular conditions by spectral analysis with confocal microscopy and dynamic light scattering, quantification of phagocytosis was conducted on a macrophage cell line in vitro. The biological impact of pHrodo functionalization (cytotoxicity, inflammatory response, and oxidative stress) was also investigated. Results validate the proof-of-concept of double fluorescent particles (FITC + pHrodo), allowing detection of entirely engulfed pHrodo particles (green and red labeling). Moreover incorporation of pHrodo had no major effects on cytotoxicity compared to particles without pHrodo, making them a powerful tool for micro- and nanotechnologies.

  15. Fabrication of micron and submicron gratings by using plasma treatment on the curved polydimethylsiloxane surfaces

    Science.gov (United States)

    Yang, Jiangtao; Tang, Jun; Guo, Hao; Liu, Wenyao; Shen, Chong; Liu, Jun; Qin, Li

    2017-10-01

    Here, a simple and low-cost fabrication strategy to efficiently construct well-ordered micron and submicron gratings on polymeric substrates by oxygen plasma treatment is reported. The Polydimethylsiloxane (PDMS) substrate is prepared on the polyethylene (PET) by spin-coating method, then the curved PDMS-PET substrates are processed in oxygen plasma. After appropriate surface treatment time in plasma the curved substrates are flattened, and well-ordered wrinkling shape gratings are obtained, due to the mechanical buckling instability. It is also demonstrated that changing the curvature radius of PDMS-PET substrates and the time of plasma treatment, the period of the wrinkling patterns and the amplitude of grating also change accordingly. It is found the period of the wrinkling patterns increased with the radius of curvature; while the amplitude decreased with that. It also shows good optical performance in transmittance diffraction testing experiments. Thus the well-ordered grating approach may further develop portable and economical applications and offer a valuable method to fabricate other optical micro strain gauges devices.

  16. 2D light scattering static cytometry for label-free single cell analysis with submicron resolution.

    Science.gov (United States)

    Xie, Linyan; Yang, Yan; Sun, Xuming; Qiao, Xu; Liu, Qiao; Song, Kun; Kong, Beihua; Su, Xuantao

    2015-11-01

    Conventional optical cytometric techniques usually measure fluorescence or scattering signals at fixed angles from flowing cells in a liquid stream. Here we develop a novel cytometer that employs a scanning optical fiber to illuminate single static cells on a glass slide, which requires neither microfluidic fabrication nor flow control. This static cytometric technique measures two dimensional (2D) light scattering patterns via a small numerical aperture (0.25) microscope objective for label-free single cell analysis. Good agreement is obtained between the yeast cell experimental and Mie theory simulated patterns. It is demonstrated that the static cytometer with a microscope objective of a low resolution around 1.30 μm has the potential to perform high resolution analysis on yeast cells with distributed sizes. The capability of the static cytometer for size determination with submicron resolution is validated via measurements on standard microspheres with mean diameters of 3.87 and 4.19 μm. Our 2D light scattering static cytometric technique may provide an easy-to-use, label-free, and flow-free method for single cell diagnostics. © 2015 International Society for Advancement of Cytometry.

  17. Ultrathin oxides for the SCM analysis of sub-micron doping profiles

    Energy Technology Data Exchange (ETDEWEB)

    Ciampolini, Lorenzo; Bertin, F.; Hartmann, J.M.; Rochat, N.; Holliger, Ph.; Laugier, F.; Chabli, A

    2003-09-15

    Attenuated total reflection (ATR) spectroscopy and spectroscopic ellipsometry (SE) have been used to characterize oxides used for the scanning capacitance microscopy (SCM) technique. SCM has been used to study boron and phosphorous doped Si test structures epitaxially grown on (100) Si substrates. SCM samples have one-dimensional (1D) doping profiles with sub-micron features, with staircase-like steps in the unipolar sample and a smoother profile in the bipolar sample, as obtained by secondary ion mass spectrometry (SIMS) profiling. Cross-sectional SCM results obtained on samples oxidized by the standard low-temperature UV-ozone method are presented, discussed and compared to results obtained on cleaved samples oxidized by a simple exposure to air. The results show that the native oxide covering a (110) cleaved section may yield SCM images of sufficient quality, with no contrast reversal on a wide range of doping levels, as well as observed on sections prepared with the UV-ozone technique. However, the long-term stability of the SCM signal on native oxides is poor, and UV-ozone oxidation can be used to recover a valid SCM signal. Realistic ultrathin oxide thickness data obtained by SE on (110) substrates are presented together with ATR results, which confirm the superior quality of UV-ozone oxides with respect to other kinds of oxides.

  18. High energy density supercapacitors from lignin derived submicron activated carbon fibers in aqueous electrolytes

    Science.gov (United States)

    Hu, Sixiao; Zhang, Sanliang; Pan, Ning; Hsieh, You-Lo

    2014-12-01

    Highly porous submicron activated carbon fibers (ACFs) were robustly generated from low sulfonated alkali lignin and fabricated into supercapacitors for capacitive energy storage. The hydrophilic and high specific surface ACFs exhibited large-size nanographites and good electrical conductivity to demonstrate outstanding electrochemical performance. ACFs from KOH activation, in particular, showed very high 344 F g-1 specific capacitance at low 1.8 mg cm-2 mass loading and 10 mV s-1 scan rate in aqueous electrolytes. Even at relatively high scan rate of 50 mV s-1 and mass loading of 10 mg cm-2, a decent specific capacitance of 196 F g-1 and a remarkable areal capacitance of 0.55 F cm-2 was obtained, leading to high energy density of 8.1 Wh kg-1 based on averaged electrodes mass. Furthermore, over 96% capacitance retention rates were achieved after 5000 charge/discharge cycles. Such excellent performance demonstrated great potential of lignin derived carbons for electrical energy storage.

  19. Assessment of intrinsic small signal parameters of submicron SiC MESFETs

    Science.gov (United States)

    Riaz, Mohammad; Ahmed, Muhammad Mansoor; Rafique, Umair; Ahmed, Umer Farooq

    2018-01-01

    In this paper, a technique has been developed to estimate intrinsic small signal parameters of submicron SiC MESFETs, designed for high power microwave applications. In the developed technique, small signal parameters are extracted by involving drain-to-source current, Ids instead of Schottky barrier depletion layer expression. It has been demonstrated that in SiC MESFETs, the depletion layer gets modified due to intense transverse electric field and/or self-heating effects, which are conventionally not taken into account. Thus, assessment of AC small signal parameters by employing depletion layer expression loses its accuracy for devices meant for high power applications. A set of expressions for AC small signal elements has been developed using Ids and its dependence on device biasing has been discussed. The validity of the proposed technique has been demonstrated using experimental data. Dr. Ahmed research interests are in Microelectronics, Microwave and RF Engineering and he has supervised numerous MS and PhD research projects. He authored over 100 research papers in the field of microelectronics. Dr. Ahmed is a fellow of the Institution of Engineering and Technology (IET), UK.; a Chartered Engineer (CEng) from the UK Engineering Council and holds the title of European Engineer (Eur Ing) from the European Federation of National Engineering Association (FEANI), Brussels. He is a life member of PEC (Pak); EDS & MTTS (USA).

  20. Minimizing biases associated with tracking analysis of submicron particles in heterogeneous biological fluids.

    Science.gov (United States)

    Wang, Ying-Ying; Nunn, Kenetta L; Harit, Dimple; McKinley, Scott A; Lai, Samuel K

    2015-12-28

    Tracking the dynamic motion of individual nanoparticles or viruses offers quantitative insights into their real-time behavior and fate in different biological environments. Indeed, particle tracking is a powerful tool that has facilitated the development of drug carriers with enhanced penetration of mucus, brain tissues and other extracellular matrices. Nevertheless, heterogeneity is a hallmark of nanoparticle diffusion in such complex environments: identical particles can exhibit strongly hindered or unobstructed diffusion within microns of each other. The common practice in 2D particle tracking, namely analyzing all trackable particle traces with equal weighting, naturally biases towards rapidly diffusing sub-populations at shorter time scales. This in turn results in misrepresentation of particle behavior and a systematic underestimate of the time necessary for a population of nanoparticles to diffuse specific distances. We show here via both computational simulation and experimental data that this bias can be rigorously corrected by weighing the contribution by each particle trace on a 'frame-by-frame' basis. We believe this methodology presents an important step towards objective and accurate assessment of the heterogeneous transport behavior of submicron drug carriers and pathogens in biological environments. Copyright © 2015 Elsevier B.V. All rights reserved.

  1. Analysis of local deformation effects in resistive strain sensing of a submicron-thickness AFM cantilever

    Science.gov (United States)

    Adams, Jonathan D.; Schwalb, Christian H.; Winhold, Marcel; Šńukić, Maja; Huth, Michael; Fantner, Georg E.

    2013-05-01

    Incorporating resistive strain-sensing elements into MEMS devices is a long-standing approach for electronic detection of the device deformation. As the need for more sensitivity trends the device dimensions downwards, the size of the strain-sensor may become comparable to the device size, which can have significant impact on the mechanical behaviour of the device. To study this effect, we modelled a submicron-thickness silicon nitride AFM cantilever with strain-sensing element. Using finite element analysis, we calculated the strain in the sensor elements for a deflected cantilever. The sensor element contributes to a local stiffening effect in the device structure which lowers the strain in the sensor. By varying the sensor geometry, we investigated the degree to which this effect impacts the strain. Minimizing the sensor size increases the strain, but the reduction in sensor cross-sectional area increases the resistance and expected sensor noise. The optimal sensor geometry must therefore account for this effect. We used our analysis to optimize geometric variations of nanogranular tunnelling resistor (NTR) strain sensors arranged in a Wheatstone bridge on a silicon nitride AFM cantilever. We varied the dimensions of each sensor element to maintain a constant cross-sectional area but maximize the strain in the sensor element. Through this approach, we expect a 45% increase in strain in the sensor and corresponding 20% increase in the Wheatstone bridge signal. Our results provide an important consideration in the design geometry of resistive strainsensing elements in MEMS devices.

  2. High altitude hypoxia, a mask and a Street. Donation of an aviation BLB oxygen mask apparatus from World War 2.

    Science.gov (United States)

    Cooper, M G; Street, N E

    2017-03-01

    The history of hypoxia prevention is closely inter-related with high altitude mountain and aviation physiology. One pioneering attempt to overcome low inspired oxygen partial pressures in aviation was the BLB mask-named after the three designers-Walter M Boothby, W Randolph Lovelace II and Arthur H Bulbulian. This mask and its variations originated just prior to World War 2 when aircraft were able to fly higher than 10,000 feet and pilot hypoxia affecting performance was an increasing problem. We give a brief description of the mask and its designers and discuss the donation of a model used by the British War Office in October 1940 and donated to the Harry Daly Museum at the Australian Society of Anaesthetists by the family of Dr Fred Street. Dr Street was a pioneering paediatric surgeon in Australia and served as a doctor in the Middle East and New Guinea in World War 2. He received the Military Cross.

  3. Source apportionment of fine PM and sub-micron particle number concentrations at a regional background site in the western Mediterranean: a 2.5 year study

    Directory of Open Access Journals (Sweden)

    M. Cusack

    2013-05-01

    Full Text Available The chemical composition and sources of ambient fine particulate matter (PM1 over a period of 2.5 years for a regional background site in the western Mediterranean are presented in this work. Furthermore, sub-micron particle number concentrations and the sources of these particles are also presented. The mean PM1 concentration for the measurement period was 8.9 μg m−3, with organic matter (OM and sulphate comprising most of the mass (3.2 and 1.5 μg m−3 respectively. Six sources were identified in PM1 by Positive Matrix Factorisation (PMF: secondary organic aerosol, secondary nitrate, industrial, traffic + biomass burning, fuel oil combustion and secondary sulphate. Typically anthropogenic sources displayed elevated concentrations during the week with reductions at weekends. Nitrate levels were elevated in winter and negligible in summer, whereas secondary sulphate levels underwent a contrasting seasonal evolution with highest concentrations in summer, similar to the fuel oil combustion source. The SOA source was influenced by episodes of sustained pollution as a result of anticyclonic conditions occurring during winter, giving rise to thermal inversions and the accumulation of pollutants in the mixing layer. Increased levels in summer were owing to higher biogenic emissions and regional recirculation of air masses. The industrial source decreased in August due to decreased emissions during the vacation period. Increases in the traffic + biomass burning source were recorded in January, April and October, which were attributed to the occurrence of the aforementioned pollution episodes and local biomass burning emission sources, which include agriculture and domestic heating systems. Average particle number concentrations (N9-825 nm from 5/11/2010 to 01/06/2011 and from 15/10/2011 to 18/12/2011 reached 3097 cm−3. Five emission sources of particle of sub-micron particles were determined by Principal Component Analysis (PCA; industrial

  4. Three-dimensional micron and submicron structures based on fiberglass technologies

    Science.gov (United States)

    Beloglazov, Valentin I.; Soukhoveev, Sergey P.; Suetin, Nikolay V.

    1999-11-01

    New microcomponent constructions and fabrication method have been proposed and developed. This new approach is based on fiberglass technology. The outstanding opportunities of this technology have been demonstrated and used for fabrication of submicrometer x-ray mask; synchronous micrometer containing permanent magnet; microcoil with 7 micrometer lines. Our technology gives an opportunity for fabrication of the structures with extremely high aspect ratio, spiral- like conductor and so on. Developed technology does not use expensive x-ray lithography. Possible application of developed technology for production different microcomponents for electron and x-ray optics components, MEMS and other devices have been discussed.

  5. Actinic Mask Inspection at the ALS Initial Design Review

    Energy Technology Data Exchange (ETDEWEB)

    Barty, A; Chapman, H; Sweeney, D; Levesque, R; Bokor, J; Gullikson, E; Jong, S; Liu, Y; Yi, M; Denbeaux, G; Goldberg, K; Naulleau, P; Denham, P; Rekawa, S; Baston, P; Tackaberry, R; Barale, P

    2003-03-05

    This report is the first milestone report for the actinic mask blank inspection project conducted at the VNL, which forms sub-section 3 of the Q1 2003 mask blank technology transfer program at the VNL. Specifically this report addresses deliverable 3.1.1--design review and preliminary tool design. The goal of this project is to design an actinic mask inspection tool capable of operating in two modes: high-speed scanning for the detection of multilayer defects (inspection mode), and a high-resolution aerial image mode in which the image emulates the imaging illumination conditions of a stepper system (aerial image or AIM mode). The purpose and objective of these two modes is as follows: (1) Defect inspection mode--This imaging mode is designed to scan large areas of the mask for defects EUV multilayer coatings. The goal is to detect the presence of multilayer defects on a mask blank and to store the co-ordinates for subsequent review in AIM mode, thus it is not essential that the illumination and imaging conditions match that of a production stepper. Potential uses for this imaging mode include: (a) Correlating the results obtained using actinic inspection with results obtained using other non-EUV defect inspection systems to verify that the non-EUV scanning systems are detecting all critical defects; (b) Gaining sufficient information to associate defects with particular processes, such as various stages of the multilayer deposition or different modes of operation of the deposition tool; and (c) Assessing the density and EUV impact of surface and multilayer anomalies. Because of the low defect density achieved using current multilayer coating technology it is necessary to be able to efficiently scan large areas of the mask in order to obtain sufficient statistics for use in cross-correlation experiments. Speed of operation as well as sensitivity is therefore key to operation in defect inspection mode. (2) Aerial Image Microscope (AIM) mode--In AIM mode the tool is

  6. Optimal mask characterization by Surrogate Wafer Print (SWaP) method

    Science.gov (United States)

    Kimmel, Kurt R.; Hoellein, Ingo; Peters, Jan Hendrick; Ackmann, Paul; Connolly, Brid; West, Craig

    2008-10-01

    Traditionally, definition of mask specifications is done completely by the mask user, while characterization of the mask relative to the specifications is done completely by the mask maker. As the challenges of low-k1 imaging continue to grow in scope of designs and in absolute complexity, the inevitable partnership between wafer lithographers and mask makers has strengthened as well. This is reflected in the jointly owned mask facilities and device manufacturers' continued maintenance of fully captive mask shops which foster the closer mask-litho relationships. However, while some device manufacturers have leveraged this to optimize mask specifications before the mask is built and, therefore, improve mask yield and cost, the opportunity for post-fabrication partnering on mask characterization is more apparent and compelling. The Advanced Mask Technology Center (AMTC) has been investigating the concept of assessing how a mask images, rather than the mask's physical attributes, as a technically superior and lower-cost method to characterize a mask. The idea of printing a mask under its intended imaging conditions, then characterizing the imaged wafer as a surrogate for traditional mask inspections and measurements represents the ultimate method to characterize a mask's performance, which is most meaningful to the user. Surrogate wafer print (SWaP) is already done as part of leading-edge wafer fab mask qualification to validate defect and dimensional performance. In the past, the prospect of executing this concept has generally been summarily discarded as technically untenable and logistically intractable. The AMTC published a paper at BACUS 2007 successfully demonstrating the performance of SWaP for the characterization of defects as an alternative to traditional mask inspection [1]. It showed that this concept is not only feasible, but, in some cases, desirable. This paper expands on last year's work at AMTC to assess the full implementation of SWaP as an

  7. Nanospectroscopy of single quantum dots with local strain control using a phase-change mask

    Science.gov (United States)

    Saiki, Toshiharu; Shintani, Toshimichi; Kuwahara, Masashi; Regreny, Philippe; Gendry, Michel

    2017-08-01

    Herein, we describe a new technique that allows high-sensitivity near-field imaging spectroscopic analysis of individual quantum constituents in semiconductors. This method employs an optical mask composed of a phase-change material (PCM) and operates at optical telecommunication wavelengths. Superior collection efficiency and spatial resolution are achieved by using an amorphous nanoaperture as a result of the extreme optical contrast between the PCM in amorphous and crystalline phases at visible wavelengths and the good near-infrared transparency of this material. Fine tuning of quantum dot (QD) emission levels via localized strain as a result of the increase in volume of the PCM upon amorphization has also been demonstrated. Both red and blue shifts of the energy levels were predicted to occur beneath the flat and edge regions of the amorphous mask, respectively, using finite element simulations. The viability of localized strain tuning as an approach to nanospectroscopy employing phase changes was confirmed by measurements of the photoluminescence of individual InAs/InP QDs. In addition, the emission levels of two neighboring QDs were matched based on modifying the shift magnitudes and directions via careful adjustment of the indenter size and position.

  8. Neurotoxicity of low-dose repeatedly intranasal instillation of nano- and submicron-sized ferric oxide particles in mice

    Energy Technology Data Exchange (ETDEWEB)

    Wang Bing; Feng Weiyue, E-mail: fengwy@mail.ihep.ac.cn; Zhu Motao; Wang Yun; Wang Meng [Chinese Academy of Sciences, Laboratory for Bio-Environmental Effects of Nanomaterials and Nanosafety and Key Laboratory of Nuclear Analytical Techniques, Institute of High Energy Physics (China); Gu Yiqun [Maternity Hospital of Haidian District (China); Ouyang Hong; Wang Huajian; Li Ming; Zhao Yuliang, E-mail: zhaoyuliang@mail.ihep.ac.cn; Chai Zhifang [Chinese Academy of Sciences, Laboratory for Bio-Environmental Effects of Nanomaterials and Nanosafety and Key Laboratory of Nuclear Analytical Techniques, Institute of High Energy Physics (China); Wang Haifang [Peking University, College of Chemistry and Molecular Engineering (China)

    2009-01-15

    Olfactory tract has been demonstrated to be an important portal for inhaled solid nanoparticle transportation into the central nervous system (CNS). We have previously demonstrated that intranasally instilled Fe{sub 2}O{sub 3} nanoparticles could transport into the CNS via olfactory pathway. In this study, we investigated the neurotoxicity and size effect of repeatedly low-dose (130 {mu}g) intranasal exposure of nano- and submicron-sized Fe{sub 2}O{sub 3} particles (21 nm and 280 nm) to mice. The biomarkers of oxidative stress, activity of nitric oxide synthases and release of monoamine neurotransmitter in the brain were studied. Our results showed that significant oxidative stress was induced by the two sizes of Fe{sub 2}O{sub 3} particles. The activities of GSH-Px, Cu,Zn-SOD, and cNOS significantly elevated and the total GSH and GSH/GSSG ratio significantly decreased in the olfactory bulb and hippocampus after the nano- and submicron-sized Fe{sub 2}O{sub 3} particle treatment (p < 0.05). The nano-sized Fe{sub 2}O{sub 3} generally induced greater alteration and more significant dose-effect response than the submicron-sized particle did. Some slight perturbation of monoamine neurotransmitters were found in the hippocampus after exposure to the two sizes of Fe{sub 2}O{sub 3} particle. The TEM image showed that some ultrastructural alterations in nerve cells, including neurodendron degeneration, membranous structure disruption and lysosome increase in the olfactory bulb, slight dilation in the rough endoplasmic reticulum and lysosome increase in the hippocampus were induced by the nano-sized Fe{sub 2}O{sub 3} treatment. In contrast, in the submicron-sized Fe{sub 2}O{sub 3} treated mice, slightly swollen mitochondria and some vacuoles were observed in the olfactory bulb and hippocampus, respectively. These results indicate that intranasal exposure of Fe{sub 2}O{sub 3} nanoparticles could induce more severe oxidative stress and nerve cell damage in the brain than the

  9. The heterogeneous reaction of hydroxyl radicals with sub-micron squalane particles: a model system for understanding the oxidative aging of ambient aerosols

    Science.gov (United States)

    Smith, J. D.; Kroll, J. H.; Cappa, C. D.; Che, D. L.; Liu, C. L.; Ahmed, M.; Leone, S. R.; Worsnop, D. R.; Wilson, K. R.

    2009-05-01

    The heterogeneous reaction of OH radicals with sub-micron squalane particles, in the presence of O2, is used as a model system to explore the fundamental chemical mechanisms that control the oxidative aging of organic aerosols in the atmosphere. Detailed kinetic measurements combined with elemental mass spectrometric analysis reveal that the reaction proceeds sequentially by adding an average of one oxygenated functional group per reactive loss of squalane. The reactive uptake coefficient of OH with squalane particles is determined to be 0.3±0.07 at an average OH concentration of ~1×1010 molecules cm-3. Based on a comparison between the measured particle mass and model predictions it appears that significant volatilization of a reduced organic particle would be extremely slow in the real atmosphere. However, as the aerosols become more oxygenated, volatilization becomes a significant loss channel for organic material in the particle-phase. Together these results provide a chemical framework in which to understand how heterogeneous chemistry transforms the physiochemical properties of particle-phase organic matter in the troposphere.

  10. The heterogeneous reaction of hydroxyl radicals with sub-micron squalane particles: a model system for understanding the oxidative aging of ambient aerosols

    Directory of Open Access Journals (Sweden)

    J. D. Smith

    2009-05-01

    Full Text Available The heterogeneous reaction of OH radicals with sub-micron squalane particles, in the presence of O2, is used as a model system to explore the fundamental chemical mechanisms that control the oxidative aging of organic aerosols in the atmosphere. Detailed kinetic measurements combined with elemental mass spectrometric analysis reveal that the reaction proceeds sequentially by adding an average of one oxygenated functional group per reactive loss of squalane. The reactive uptake coefficient of OH with squalane particles is determined to be 0.3±0.07 at an average OH concentration of ~1×1010 molecules cm−3. Based on a comparison between the measured particle mass and model predictions it appears that significant volatilization of a reduced organic particle would be extremely slow in the real atmosphere. However, as the aerosols become more oxygenated, volatilization becomes a significant loss channel for organic material in the particle-phase. Together these results provide a chemical framework in which to understand how heterogeneous chemistry transforms the physiochemical properties of particle-phase organic matter in the troposphere.

  11. Edge enhancement of computed tomograms by digital unsharp masking.

    Science.gov (United States)

    Winter, J

    1980-04-01

    Edge enhanced images can be produced on existing commercial computed tomographic equipment by a method called "digital unsharp masking" without any expense or computer software development. This technique permits display of anatomic areas having an extremely wide range of densities, while making edge detail more apparent.

  12. Airway Management via Laryngeal Mask in Laryngotracheal Resection

    OpenAIRE

    Zardo, Patrick; Kreft, Tom; Hachenberg, Thomas

    2015-01-01

    We present a case of impassable subglottic stenosis scheduled for tracheal resection and reconstruction managed by establishing a supraglottic airway. Despite careful preoperative evaluation, the stenosis was localized higher than anticipated, rendering conventional intubation impossible. Laryngeal mask bridging to cross-field ventilation was feasible and jet ventilation and cardiopulmonary bypass were available as emergency strategies. Surgery and emergence went uneventful. Perioperative con...

  13. High Reading Skills Mask Dyslexia in Gifted Children

    Science.gov (United States)

    van Viersen, Sietske; Kroesbergen, Evelyn H.; Slot, Esther M.; de Bree, Elise H.

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with dyslexia, gifted children, gifted children with…

  14. Pop the Pills without Bitterness-Taste-Masking Technologies for ...

    Indian Academy of Sciences (India)

    Home; Journals; Resonance – Journal of Science Education; Volume 9; Issue 12. Pop the Pills without Bitterness - Taste-Masking Technologies for Bitter Drugs. K Gowthamarajan Giriraj T Kulkarni M Narendra Kumar. General Article Volume 9 Issue 12 December 2004 pp 25-32 ...

  15. Multi-shaped e-beam technology for mask writing

    Science.gov (United States)

    Gramss, Juergen; Stoeckel, Arnd; Weidenmueller, Ulf; Doering, Hans-Joachim; Bloecker, Martin; Sczyrba, Martin; Finken, Michael; Wandel, Timo; Melzer, Detlef

    2010-09-01

    Photomask lithography for the 22nm technology node and beyond requires new approaches in equipment as well as mask design. Multi Shaped Beam technology (MSB) for photomask patterning using a matrix of small beamlets instead of just one shaped beam, is a very effective and evolutionary enhancement of the well established Variable Shaped Beam (VSB) technique. Its technical feasibility has been successfully demonstrated [2]. One advantage of MSB is the productivity gain over VSB with decreasing critical dimensions (CDs) and increasing levels of optical proximity correction (OPC) or for inverse lithography technology (ILT) and source mask optimization (SMO) solutions. This makes MSB an attractive alternative to VSB for photomask lithography at future technology nodes. The present paper describes in detail the working principles and advantages of MSB over VSB for photomask applications. MSB integrates the electron optical column, x/y stage and data path into an operational electron beam lithography system. Multi e-beam mask writer specific requirements concerning the computational lithography and their implementation are outlined here. Data preparation of aggressive OPC layouts, shot count reductions over VSB, data path architecture, write time simulation and several aspects of the exposure process sequence are also discussed. Analysis results of both the MSB processing and the write time of full 32nm and 22nm node critical layer mask layouts are presented as an example.

  16. Masked translation priming effects with low proficient bilinguals

    National Research Council Canada - National Science Library

    Dimitropoulou, Maria; Duñabeitia, Jon Andoni; Carreiras, Manuel

    2011-01-01

    ... (Experimental Psychology 56:173–179). In a series of masked translation priming lexical decision experiments we examined whether the same pattern of effects would emerge with late and low proficient Greek (L1)–Spanish (L2) bilinguals...

  17. Comodulation masking release in bit-rate reduction systems

    DEFF Research Database (Denmark)

    Vestergaard, Martin David; Rasmussen, Karsten Bo; Poulsen, Torben

    1999-01-01

    in accordance with psycho-acoustical principles. Masker frequencies of 500 Hz, 1 kHz, and 2 kHz have been investigated, and the masking of pure tone probes has been determined in the first four 1/3 octaves above the masker. Modulation frequencies between 6 and 20 Hz were used with a modulation depth of 0...

  18. Improvement of ZEP process for advanced mask fabrication

    Science.gov (United States)

    Kushida, Yasuyuki; Usui, Youichi; Shirai, Hisatsugu

    2000-07-01

    In mask making, ZEP 7000 resist process with MEBES writing tool is widely adopted to produce advanced masks. This time, we tried to improve resist pattern CD uniformity in ZEP process using our special techniques. Resist sensitivity uniformity of mask blank is one of the most significant parameters for resist pattern CD uniformity. In ZEP7000 coating process, our original cooling method waw adopted in consideration of its resist sensitivity properties. Resist film thickness loss (RTL) uniformity during development was examined in order to analyze the resists sensitivity uniformity within a mask blank. It was clearly seen that resist pattern CD uniformity was 15nm with the optimum cooling condition. RTL uniformity and resist pattern CD uniformity were also examined using blanks which were commercially available from two vendors. And these results were compared with the results of our original cooling method. Based on the results of our study, we confirmed that our original cooling method was very effective for improvement of resist pattern CD uniformity on ZEP process.

  19. Single-mask thermal displacement sensor in MEMS

    NARCIS (Netherlands)

    Krijnen, B.; Hogervorst, R.P.; Engelen, Johannes Bernardus Charles; van Dijk, J.W.; Brouwer, Dannis Michel; Abelmann, Leon

    In this work we describe a one degree- of-freedom microelectromechanical thermal displacement sensor integrated with an actuated stage. The system was fabricated in the device layer of a silicon-on-insulator wafer using a single-mask process. The sensor is based on the temperature dependent

  20. The Laryngeal Mask Airway (LMA) as an alternative to airway ...

    African Journals Online (AJOL)

    Background: To evaluate the possibility of airway management using a laryngeal mask airway (LMA) during dental procedures on mentally retarded (MR) patients and patients with genetic diseases. Design: A prospective pilot study. Setting: University Hospital. Methods: A pilot study was designed to induce general ...

  1. Optical synchrotron radiation beam imaging with a digital mask

    Energy Technology Data Exchange (ETDEWEB)

    Zhang, Hao [Univ. of Maryland, College Park, MD (United States); Fiorito, Ralph [Univ. of Maryland, College Park, MD (United States); Corbett, Jeff [SLAC National Accelerator Lab., Menlo Park, CA (United States); Shkvarunets, Anatoly [Univ. of Maryland, College Park, MD (United States); Tian, Kai [SLAC National Accelerator Lab., Menlo Park, CA (United States); Fisher, Alan [SLAC National Accelerator Lab., Menlo Park, CA (United States); Douglas, D. [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Wilson, F. [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Zhang, S. [Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Mok, W. [SLAC National Accelerator Lab., Menlo Park, CA (United States); Mitsuhashi, T. [KEK, Tsukuba (Japan)

    2016-01-01

    The 3GeV SPEAR3 synchrotron light source operates in top-up injection mode with up to 500mA circulating in the storage ring (equivalently 392nC). Each injection pulse contains only 40-80 pC producing a contrast ratio between total stored charge and injected charge of about 6500:1. In order to study transient injected beam dynamics during User operations, it is desirable to optically image the injected pulse in the presence of the bright stored beam. In the present work this is done by re-imaging visible synchrotron radiation onto a digital micro-mirror-array device (DMD), which is then used as an optical mask to block out light from the bright central core of the stored beam. The physical masking, together with an asynchronously-gated, ICCD imaging camera makes it is possible to observe the weak injected beam component on a turn-by-turn basis. The DMD optical masking system works similar to a classical solar coronagraph but has some distinct practical advantages: i.e. rapid adaption to changes in the shape of the stored beam, high extinction ratio for unwanted light and minimum scattering from the primary beam into the secondary optics. In this paper we describe the DMD masking method, features of the high dynamic range point spread function for the SPEAR3 optical beam line and measurements of the injected beam in the presence of the stored beam.

  2. High reading skills mask dyslexia in gifted children

    NARCIS (Netherlands)

    van Viersen, Sietske; Kroesbergen, Evelyn|info:eu-repo/dai/nl/241607949; Slot, Esther; de Bree, Elise|info:eu-repo/dai/nl/292748868

    2014-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with

  3. "Kuldne mask" - hea vene teater Eestis / Laur Kaunissaare

    Index Scriptorium Estoniae

    Kaunissaare, Laur, 1982-

    2009-01-01

    6.-13. okt. Tallinnas ja Jõhvis toimuvast Venemaa rahvuslikust teatrifestivalist "Kuldne mask Eestis". Festivali lavastustest - Temur Tšheidze "Onukese unenägu", Declan Donnellan "Kaheteistkümnes öö", Lev Erenburgi "Äike" ja Alvis Hermanise "Šukšini jutustused"

  4. High reading skills mask dyslexia in gifted children

    NARCIS (Netherlands)

    van Viersen, S.; Kroesbergen, E.H.; Slot, E.M.; de Bree, E.H.

    2016-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possible compensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over four groups (typically developing [TD] children, children with

  5. Causal binary mask estimation for speech enhancement using sparsity constraints

    DEFF Research Database (Denmark)

    Kressner, Abigail Anne; Anderson, David V.; Rozell, Christopher J.

    2013-01-01

    While most single-channel noise reduction algorithms fail to improve speech intelligibility, the ideal binary mask (IBM) has demonstrated substantial intelligibility improvements for both normal- and impaired-hearing listeners. However, this approach exploits oracle knowledge of the target and in...... algorithm from the signal processing literature. However, the algorithm employs a non-causal estimator. The present work introduces an improved de-noising algorithm that uses more realistic frame-based (causal) computations to estimate a binary mask.......While most single-channel noise reduction algorithms fail to improve speech intelligibility, the ideal binary mask (IBM) has demonstrated substantial intelligibility improvements for both normal- and impaired-hearing listeners. However, this approach exploits oracle knowledge of the target...... the disjoint placement of the target and interferer in time and frequency to create a time-frequency signal representation that is more sparse (i.e., has fewer non-zeros). In recent work (submitted to ICASSP 2013) we have introduced a novel time-frequency masking algorithm based on a sparse approximation...

  6. Prognostic importance of white coat and masked hypertention

    DEFF Research Database (Denmark)

    Gustavsen, Pia; Hansen, Tine

    2009-01-01

    The growing use of ambulatory blood pressure monitoring has led to an increased awareness of the two types of discrepancy between office blood pressure and ambulatory blood pressure, called white coat hypertension (WCH) and masked hypertension (MH). Based on several longitudinal studies, WCH...

  7. High reading skills mask dyslexia in gifted children

    NARCIS (Netherlands)

    Viersen, S. van; Kroesbergen, E.H.; Slot, E.M.; Bree, E.H. de

    2014-01-01

    This study investigated how gifted children with dyslexia might be able to mask literacy problems and the role of possiblecompensatory mechanisms. The sample consisted of 121 Dutch primary school children that were divided over fourgroups (typically developing [TD] children, children with dyslexia,

  8. [Mask anesthesia for cerebral angiography in childhood moyamoya disease].

    Science.gov (United States)

    Touho, Hajime; Ueki, Hiroshi; Hayashi, Takeshi; Hara, Yasufumi; Hara, Tomoko; Hosoi, Satoshi

    2006-01-01

    Cerebral angiography is performed for diagnosis and management of moyamoya disease and in childhood moyamoya disease is usually carried out under general anesthesia after tracheal intubation. Mechanical irritation to trachea resulting in pain,cough,and increase in secretion after termination of the general anesthesia sometimes occurs and it sometimes causes hyperventilation resulting in hypocapnea. Continuous hypocapnea sometimes causes appearance of ischemic attacks in moyamoya disease. In the present study, we examine cerebral angiography conducted under general anesthesia using face mask ventilation in fourteen children with moyamoya disease. Sevoflurane was used as inhalation anesthetics. Face mask anesthesia was sixteen times in total in the 14 patients. Cerebral angiography terminated uneventfully in these patients except one patient who showed bronchospasm after induction of anesthesia and required tracheal intubation. However, the patient showed uneventful course after termination of the angiography. Tracheal irritation did not appear and all the patients were asleep just after termination of face mask anesthesia except for the patient who required tracheal intubation. In the latter case, the patient frequently coughed out phlegm after general anesthesia with tracheal intubation. In conclusion, general anesthesia with face mask ventilation was thought to be one of the suitable anesthetic methods introduced for cerebral angiography in childhood moyamoya disease.

  9. The Laryngeal Mask Airway Supreme™: safety and efficacy during ...

    African Journals Online (AJOL)

    Background: Laryngeal Mask Airway Supreme™ (LMA Supreme™) is a new single-use polyvinyl chloride supraglottic device that offers gastric access. To date, studies that have tested the LMA Supreme™) for use in laparoscopic surgery have been reported. We present the largest evaluative study that describes the use of ...

  10. Generalization of Supervised Learning for Binary Mask Estimation

    DEFF Research Database (Denmark)

    May, Tobias; Gerkmann, Timo

    2014-01-01

    This paper addresses the problem of speech segregation by es- timating the ideal binary mask (IBM) from noisy speech. Two methods will be compared, one supervised learning approach that incorporates a priori knowledge about the feature distri- bution observed during training. The second method so...

  11. Efficient scan mask techniques for connected components labeling algorithm

    Directory of Open Access Journals (Sweden)

    Sutheebanjard Phaisarn

    2011-01-01

    Full Text Available Abstract Block-based connected components labeling is by far the fastest algorithm to label the connected components in 2D binary images, especially when the image size is quite large. This algorithm produces a decision tree that contains 211 leaf nodes with 14 levels for the depth of a tree and an average depth of 1.5923. This article attempts to provide a faster method for connected components labeling. We propose two new scan masks for connected components labeling, namely, the pixel-based scan mask and the block-based scan mask. In the final stage, the block-based scan mask is transformed to a near-optimal decision tree. We conducted comparative experiments using different sources of images for examining the performance of the proposed method against the existing methods. We also performed an average tree depth analysis and tree balance analysis to consolidate the performance improvement over the existing methods. Most significantly, the proposed method produces a decision tree containing 86 leaf nodes with 12 levels for the depth of a tree and an average depth of 1.4593, resulting in faster execution time, especially when the foreground density is equal to or greater than the background density of the images.

  12. 42 CFR 84.111 - Gas masks; required components.

    Science.gov (United States)

    2010-10-01

    ....111 Public Health PUBLIC HEALTH SERVICE, DEPARTMENT OF HEALTH AND HUMAN SERVICES OCCUPATIONAL SAFETY... cartridge; (3) Canister harness; (4) External check valve; and (5) Breathing tube. (b) The components of each gas mask shall meet the minimum construction requirements set forth in subpart G of this part. ...

  13. Evaluation of the Intubating Laryngeal Mask Airway (ILMA) as an ...

    African Journals Online (AJOL)

    by-nc/3.0. Evaluation of the Intubating Laryngeal Mask Airway (ILMA) as an intubation conduit in patients with a cervical collar simulating fixed cervical spine. S Sainia, R Balaa* and R Singhb. aDepartment of Anaesthesiology & Critical Care, ...

  14. Benchmarking EUV mask inspection beyond 0.25 NA

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Anderson, Erik H.; Rekawa, Seno B.; Kemp, Charles D.; Huh, S.; Han, H.-S.; Naulleau, P.; Gunion, R.F.

    2008-09-18

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV-wavelength mask inspection microscope designed for direct aerial image measurements, and pre-commercial EUV mask research. Operating on a synchrotron bending magnet beamline, the AIT uses an off-axis Fresnel zoneplate lens to project a high-magnification EUV image directly onto a CCD camera. We present the results of recent system upgrades that have improved the imaging resolution, illumination uniformity, and partial coherence. Benchmarking tests show image contrast above 75% for 100-nm mask features, and significant improvements and across the full range of measured sizes. The zoneplate lens has been replaced by an array of user-selectable zoneplates with higher magnification and NA values up to 0.0875, emulating the spatial resolution of a 0.35-NA 4 x EUV stepper. Illumination uniformity is above 90% for mask areas 2-{micro}m-wide and smaller. An angle-scanning mirror reduces the high coherence of the synchrotron beamline light source giving measured {sigma} values of approximately 0.125 at 0.0875 NA.

  15. Actinic EUV mask inspection beyond 0.25 NA

    Energy Technology Data Exchange (ETDEWEB)

    Goldberg, Kenneth A.; Mochi, Iacopo; Anderson, Erik H.; Rekawa, Seno. B.; Kemp, Charles D.; Huh, S.; Han, H.-S.; Naulleau, P.; Huh, S.

    2008-03-24

    The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV-wavelength mask inspection microscope designed for direct aerial image measurements, and pre-commercial EUV mask research. Operating on a synchrotron bending magnet beamline, the AIT uses an off-axis Fresnel zoneplate lens to project a high-magnification EUV image directly onto a CCD camera. We present the results of recent system upgrades that have improved the imaging resolution, illumination uniformity, and partial coherence. Benchmarking tests show image contrast above 75% for 100-nm mask features, and significant improvements and across the full range of measured sizes. The zoneplate lens has been replaced by an array of user-selectable zoneplates with higher magnification and NA values up to 0.0875, emulating the spatial resolution of a 0.35-NA 4x EUV stepper. Illumination uniformity is above 90% for mask areas 2-{micro}m-wide and smaller. An angle-scanning mirror reduces the high coherence of the synchrotron beamline light source giving measured {sigma} values of approximately 0.125 at 0.0875 NA.

  16. Coronagraph-integrated wavefront sensing with a sparse aperture mask

    Science.gov (United States)

    Subedi, Hari; Zimmerman, Neil T.; Kasdin, N. Jeremy; Cavanagh, Kathleen; Riggs, A. J. Eldorado

    2015-07-01

    Stellar coronagraph performance is highly sensitive to optical aberrations. In order to effectively suppress starlight for exoplanet imaging applications, low-order wavefront aberrations entering a coronagraph, such as tip-tilt, defocus, and coma, must be determined and compensated. Previous authors have established the utility of pupil-plane masks (both nonredundant/sparse-aperture and generally asymmetric aperture masks) for wavefront sensing (WFS). Here, we show how a sparse aperture mask (SAM) can be integrated with a coronagraph to measure low-order differential phase aberrations. Starlight rejected by the coronagraph's focal plane stop is collimated to a relay pupil, where the mask forms an interference fringe pattern on a subsequent detector. Our numerical Fourier propagation models show that the information encoded in the fringe intensity distortions is sufficient to accurately discriminate and estimate Zernike phase modes extending from tip-tilt up to radial degree n=5, with amplitude up to λ/20 RMS. The SAM sensor can be integrated with both Lyot and shaped pupil coronagraphs at no detriment to the science beam quality. We characterize the reconstruction accuracy and the performance under low flux/short exposure time conditions, and place it in context of other coronagraph WFS schemes.

  17. Feasibility study of the usefulness of SRS thermoplastic mask for head and neck cancer in tomotherapy

    Energy Technology Data Exchange (ETDEWEB)

    Jeon, Seong Jin; Kim, Chul Jong; Kwon, Dong Yeol; Kim, Jong Sik [Dept. of Radiation Oncology, Sam Sung Seoul hospital, Seoul (Korea, Republic of)

    2014-12-15

    When head and neck cancer radiation therapy, thermoplastic mask is applied for patients with fixed. The purpose of this study is to evaluate usefulness of thermoplastic mask for SRS in tomotherapy by conparison with the conventional mask. Typical mask(conventional mask, C-mask) and mask for SRS are used to fix body phantom(rando phantom) on the same iso centerline, then simulation is performed. Tomotherapy plan for orbit and salivary glands is made by treatment planning system(TPS). A thick portion and a thin portion located near the treatment target relative to the mask S-mask are defined as region of interest for surface dose dosimetry. Surface dose variation depending on the type of mask was analyzed by measuring the TPS and EBT film. Surface dose variation due to the type of mask from the TPS is showed in orbit and salivary glands 0.65-2.53 Gy, 0.85-1.84 Gy, respectively. In case of EBT film, -0.2-3.46 Gy, 1.04-3.02 Gy. When applied to the S-mask, in TPS and Gafchromic EBT3 film, substrantially 4.26%, 5.82% showed maximum changing trend, respectively. To apply S-mask for tomotherapy, surface dose is changed, but the amount is insignificant and be useful when treatment target is close critical organs because decrease inter and intra fractional variation.

  18. Techniques of preoxygenation in patients with ineffective face mask seal

    Directory of Open Access Journals (Sweden)

    Pankaj Kundra

    2013-01-01

    Full Text Available Background: Ineffective face mask seal is the most common cause for suboptimal pre-oxygenation. Room air entrainment can be more with vital capacity (VC breaths when the mask is not a tight fit. Aims: This study was designed to compare 5 min tidal volume (TV breathing and eight VC breaths in patients with ineffective face mask seal. Methods: Twenty eight ASA I adults with ineffective face mask seal were randomized to breathe 100% oxygen at normal TV for 5 min (Group TV and eight VC breaths (Group VC in a cross over manner through circle system at 10 L/min. End tidal oxygen concentration (EtO 2 and arterial blood gas analysis was performed to evaluate oxygenation with each technique. Statistical Analysis: Data were analysed using SPSS statistical software, version 16. Friedman′s two-way analysis of variance by ranks was used for non-parametric data. Results: Significant increase in EtO 2 (median 90 and PaO 2 (228.85 was seen in group TV when compared to group VC (EtO 2 median 85, PaO 2 147.65, P<0.05. Mean total ventilation volume in 1 min in group VC was 9.4±3.3 L/min and more than fresh gas flow (10 L/min in seven patients. In group TV, the fresh gas flow (50 L/5 min was sufficient at normal TV (mean total ventilation in 5 min 36.7±6.3 L/min. Conclusions: TV breathing for 5 min provides better pre-oxygenation in patients with ineffective mask seal with fresh gas flow of 10 L/min delivered through a circle system.

  19. AIRWAY RETENTION OF MATERIALS OF DIFFERENT SOLUBILITY FOLLOWING LOCAL INTRABRONCHIAL DEPOSITION IN DOGS

    Science.gov (United States)

    We used a gamma camera to monitor the retention and clearance of radiolabeled human serum albumin (HSA), a water-soluble material with molecular weight of 66,000 Daltons, and radiolabeled sulfur colloid (SC), an insoluble submicron (0.22 microm) particle, following localized depo...

  20. X, Ku-band microwave-absorption properties of polyarylene ether nitriles terminated with phthalonitrile/Fe{sub 3}O{sub 4} hybrid submicron spheres

    Energy Technology Data Exchange (ETDEWEB)

    Tong, Lifen, E-mail: 361626614@qq.com; Pu, Zejun; Huang, Xu; Liu, Xiaobo, E-mail: liuxb@uestc.edu.cn

    2014-05-01

    Highlights: • PEN-t-Ph/Fe{sub 3}O{sub 4} hybrid spheres were prepared via one-step solvothermal method. • Polymer compatibility is introduced into inorganic submicron spheres successfully. • PEN-t-Ph/Fe{sub 3}O{sub 4} hybrid submicron spheres possessed good ferrimagnetism. • Control the microwave absorption band of PEN-t-Ph/Fe{sub 3}O{sub 4} hybrid submicron spheres. - Abstract: A novel series of PEN-t-Ph/Fe{sub 3}O{sub 4} hybrid submicron spheres with different additions of PEN-t-Ph have been prepared successfully via solvothermal method, and their structures and morphologies were characterized by X-ray powder diffraction (XRD), energy dispersive spectrometer (EDS), Fourier transform infrared spectrophotometer (FTIR), and scanning electron microscopy (SEM). The results revealed that the crystallinity, dispersity, and size of hybrid submicron spheres can be controlled by altering the addition content of PEN-t-Ph. Magnetization measurement showed that the PEN-t-Ph/Fe{sub 3}O{sub 4} hybrid submicron spheres possessed good ferrimagnetism. The electromagnetic measurement indicated that the resonance peaks of complex permittivity, complex permeability, dielectric loss, and magnetic loss were shifted to the higher frequency as the addition of PEN-t-Ph increased. Moreover, the microwave absorption band was also shifted to higher frequency as the addition of PEN-t-Ph increased. Through this method, the polymer compatibility can be introduced into inorganic submicron spheres, which could provide the inorganic particles with more applications.

  1. Green Nanotechnology Serving the Bioeconomy: Natural Beauty Masks to Save the Environment

    Directory of Open Access Journals (Sweden)

    Pierfrancesco Morganti

    2016-12-01

    Full Text Available According to United Nations Environment Programme (UNEP, ensuring a clean and healthy environment will provide multiple benefits to society and economy. Sustainable production, followed by appropriate management of industrial and agricultural waste, will protect and enhance biodiversity and ecosystem services. To achieve this objective, specific policies must be put in place and specific actions performed for making a low-carbon and resource-efficient economy with reduced production of petrol-derived goods. The aim of the study has been to produce effective and safe anti-age beauty masks made of non-woven tissues based on the use of chitin nanofibril (CN and nanolignin (LG, obtained from crustaceans and plant biomass, respectively. To this purpose, nanoparticles and electrospun fibres have been characterized by Dynamic Light Scattering and SEM, while the safeness and effectiveness of the obtained tissues was verified in vitro on a culture of keratinocytes and fibroblasts, and controlled in vivo by expert dermatologists on 30 volunteer photo-aged women, by subjective and objective bioengineered methods. The in vitro results have shown that the beauty masks have no toxic effects on the viability of keratinocytes and fibroblasts treated by the Dimethyl Tetrazole (MTT method, and exhibit a decreased expression of cytokines, playing a central role in the regulation of immune and inflammatory responses in premature aging and environmental assaults. The reparative and antiaging effectiveness of these innovative beauty masks have been also verified on the release of Metallo Proteinase I (MMP-1 and the increased synthesis of collagen type I, reduced in skin aging. The first preliminary in vivo results, obtained by engineering methods, have confirmed the protective and rejuvenating activity shown by the in vitro study conducted on 30 voluntary women exhibiting signs of photoaging. The raw materials used are of natural origin being also respectful of the

  2. Ventilation with facial mask in the prone position for radiotherapy procedures in children.

    Science.gov (United States)

    Perez-Ferrer, A; Gredilla-Díaz, E; de Vicente-Sánchez, J; Kollmann-Camaiora, A; Escribano, A

    2016-04-01

    Ventilation of patients undergoing procedures in the prone position represents a challenge for the anesthesiologist, especially when trying to avoid tracheal intubation. This study aimed to test the effectiveness and safety of a prototype designed for pediatric facial mask ventilation in the prone position. A prospective descriptive study was conducted on 105 sedations performed in 3 children scheduled for radiotherapy treatment of posterior fossa desmoplastic medulloblastoma (6 and 4 y.o. males), and neuroblastoma in temporal area (4 y.o. male). Induction and maintenance of sedation were conducted with sevoflurane in oxygen, maintaining spontaneous ventilation. After achieving loss of consciousness and immobility, the patients were placed in the prone position. Their heads were fixed with the forehead and face supported by a prototype made with a cast of expanded polystyrene (EPS), which held the facial mask (connected to a Mapleson D circuit), and the back of the head immobilized with a layer of thermoplastic material. Time variables and complications were recorded. All sedations were performed according to the planned protocol. All patients maintained oxygen saturation levels above 95%, and no complications were reported. Daily hospital length of stay including the procedure and post anesthetic recovery was 54.4±7.9 min (mean±SD). The prototype and the sedation technique with face mask in the prone position employed were effective and safe, allowing the completion of the radiotherapy sessions and securing the airway in a minimally invasive way, maintaining adequate ventilation, light sedation and enabling early hospital discharge. Copyright © 2015 Sociedad Española de Anestesiología, Reanimación y Terapéutica del Dolor. Publicado por Elsevier España, S.L.U. All rights reserved.

  3. Comparing the Efficacy of Face Mask CPAP with Nasopharyngeal CPAP for Neonatal Transport after Delivery

    Directory of Open Access Journals (Sweden)

    Manizheh Mostafa-Gharehbaghi

    2013-09-01

    Full Text Available Background: Preterm infants have respiratory failure and complications because surfactant in alveolus is low. CPAP (Continuous positive airway pressure is a method for respiratory support in pre-term neonates and is provided by different equipment and methods. This study aims to compare two different routes of CPAP delivery in preterm newborn infants and to determine the need for surfactant replacement therapy in two groups. Materials and Methods: This is a randomized controlled clinical trial. Eighty four preterm infants delivered in Al-Zahra Hospital with gestational age 28-32 weeks were enrolled in this study from January 2012 to September 2012. They were randomly allocated in two groups. After initial stabilization in delivery room, forty two infants transferred to neonatal intensive care unit (NICU with face mask CPAP and 42 infant with nasopharyngeal CPAP and continued nasal CPAP in the NICU in both groups. All infants were followed for developing respiratory distress and need for surfactant replacement therapy and oxygen dependency till discharge.Results: The neonates that treated with two methods of CPAP delivery were similar with respect to gestation age, birth weight and other demographic characteristics. Twenty three neonates (65.5% in face mask group and 15 neonates (39.5% in nasopharyngeal CPAP group need surfactant replacement therapy (p=0.08.Conclusion: Mask CPAP or nasopharyngeal CPAP can used in preterm infants after delivery for neonatal transfer to NICU. This study showed no method of CPAP delivery is preferable to other in decreasing the need for surfactant therapy.

  4. Airway obstruction and gas leak during mask ventilation of preterm infants in the delivery room.

    LENUS (Irish Health Repository)

    2011-07-01

    Preterm infants with inadequate breathing receive positive pressure ventilation (PPV) by mask with variable success. The authors examined recordings of PPV given to preterm infants in the delivery room for prevalence of mask leak and airway obstruction.

  5. The minimum thickness of a multilayer porcelain restoration required for masking severe tooth discoloration

    National Research Council Canada - National Science Library

    Shadman, Niloofar; Kandi, Saeideh Gorji; Ebrahimi, Shahram Farzin; Shoul, Maryam Azizi

    2015-01-01

    ... (IvoclarVivadent, Schaan, Liechtenstein) restoration required to mask discolored tooth. The aim of this study was to determine the minimum thickness of a multilayer porcelain restoration required for masking severe tooth discoloration...

  6. US EPA Regional Masks Web Service, US, 2015, US EPA, SEGS

    Data.gov (United States)

    U.S. Environmental Protection Agency — This web service contains the following map layers: masks and labels for EPA regions 1 through 10. Mask layers are drawn at all scales. Label layers draw at scales...

  7. Integrated method of mask data checking and inspection data prep for manufacturable mask inspection: inspection rule violations

    Science.gov (United States)

    McCall, Joan; Reddy, Vinod; Kim, Hyung M.; Babasa, Mark

    2002-03-01

    Many mask patterns contain small un-inspectable features (Inspection Rule Violations or IRVs) that create significant through-put time (TPT) impact at mask inspection due to excessive false defects. These small features include a) drawn test designs purposely intended to be small for evaluating process capabilities, and b) un-intended small features that result from errors such as overlap of designs, gaps between cells or synthesis errors. Typically, an IRV is a feature smaller than the minimum feature size capability of the mask inspection tool. This paper describes an integrated method to find such IRVs in the data and either fix them or declare that area as not inspectable. The method includes documented drawn size limits for inspectability, data checks at drawn level, data checks at post-fracture, and functions to define 'Do Not Inspect Regions (DNIRs)' for any remaining IRVs in the data. Data checking at post-fracture must comprehend Optical Proximity Correction (OPC), which generates small features that are not IRVs. The defined DNIRs are listed in the jobdeck for automated inspection data preparation with no engineering intervention. The result is improved mask inspection TPT as well as early detection and correction of certain design or synthesis errors.

  8. A statistical analysis of North East Atlantic (submicron aerosol size distributions

    Directory of Open Access Journals (Sweden)

    M. Dall'Osto

    2011-12-01

    Full Text Available The Global Atmospheric Watch research station at Mace Head (Ireland offers the possibility to sample some of the cleanest air masses being imported into Europe as well as some of the most polluted being exported out of Europe. We present a statistical cluster analysis of the physical characteristics of aerosol size distributions in air ranging from the cleanest to the most polluted for the year 2008. Data coverage achieved was 75% throughout the year. By applying the Hartigan-Wong k-Means method, 12 clusters were identified as systematically occurring. These 12 clusters could be further combined into 4 categories with similar characteristics, namely: coastal nucleation category (occurring 21.3 % of the time, open ocean nucleation category (occurring 32.6% of the time, background clean marine category (occurring 26.1% of the time and anthropogenic category (occurring 20% of the time aerosol size distributions. The coastal nucleation category is characterised by a clear and dominant nucleation mode at sizes less than 10 nm while the open ocean nucleation category is characterised by a dominant Aitken mode between 15 nm and 50 nm. The background clean marine aerosol exhibited a clear bimodality in the sub-micron size distribution, with although it should be noted that either the Aitken mode or the accumulation mode may dominate the number concentration. However, peculiar background clean marine size distributions with coarser accumulation modes are also observed during winter months. By contrast, the continentally-influenced size distributions are generally more monomodal (accumulation, albeit with traces of bimodality. The open ocean category occurs more often during May, June and July, corresponding with the North East (NE Atlantic high biological period. Combined with the relatively high percentage frequency of occurrence (32.6%, this suggests that the marine biota is an important source of new nano aerosol particles in NE Atlantic Air.

  9. Simulation of hurricane response to suppression of warm rain by sub-micron aerosols

    Directory of Open Access Journals (Sweden)

    D. Rosenfeld

    2007-07-01

    Full Text Available The feasibility of hurricane modification was investigated for hurricane Katrina using the Weather Research and Forecasting Model (WRF. The possible impact of seeding of clouds with submicron cloud condensation nuclei (CCN on hurricane structure and intensity as measured by nearly halving of the area covered by hurricane force winds was simulated by "turning–off" warm rain formation in the clouds at Katrina's periphery (where wind speeds were less than 22 m s−1. This simplification of the simulation of aerosol effects is aimed at evaluating the largest possible response. This resulted in the weakening of the hurricane surface winds compared to the "non-seeded" simulated storm during the first 24 h within the entire tropical cyclone (TC area compared to a control simulation without warm rain suppression. Later, the seeding-induced evaporative cooling at the TC periphery led to a shrinking of the eye and hence to some increase in the wind within the small central area of the TC. Yet, the overall strength of the hurricane, as defined by the area covered by hurricane force winds, decreased in response to the suppressed warm rain at the periphery, as measured by a 25% reduction in the radius of hurricane force winds. In a simulation with warm rain suppression throughout the hurricane, the radius of the hurricane force winds was reduced by more than 42%, and although the diameter of the eye shrunk even further the maximum winds weakened. This shows that the main mechanism by which suppressing warm rain weakens the TC is the low level evaporative cooling of the un-precipitated cloud drops and the added cooling due to melting of precipitation that falls from above.

  10. Sub-micron opto-chemical probes for studying living neurons

    Science.gov (United States)

    Hossein-Zadeh, M.; Delgado, J.; Schweizer, F.; Lieberman, R.

    2017-02-01

    We have fabricated sub-micron opto-chemical probes for pH, oxygen and calcium monitoring and demonstrated their application in intracellular and extracellular monitoring of neurons (cortical neuronal cultures and acute hippocampal slices). Using these probes, we have measured extracellular pH in the stratum radiatum of the CA1 region of mouse hippocampus upon stimulation of presynaptic Schaffer collateral axons. Synaptic transmission was monitored using standard electrophysiological techniques. We find that the local pH transiently changes in response to synaptic stimulation. In addition, the geometry of the functionalized region on the probe combined with high sensitivity imaging enables simultaneous monitoring of spatially adjacent but distinct compartments. As proof of concept we impaled cultured neurons with the probe measured calcium and pH inside as well as directly outside of neurons as we changed the pH and calcium concentration in the physiological solution in the perfusion chamber. As such these probes can be used to study the impact of the environment on both cellular and extra-cellular space. Additionally as the chemical properties of the surrounding medium can be controlled and monitored with high precision, these probes enable differential measurement of the target parameter referenced to a stable bath. This approach eliminates the uncertainties associated with non-chemical fluctuations in the fluorescent emission and result in a self-calibrated opto-chemical probe. We have also demonstrated multifunctional probes that are capable of measuring up to three parameters in the extracellular space in brain slices.

  11. Submicron Matrices Embedded in a Polymeric Caplet for Extended Intravaginal Delivery of Zidovudine.

    Science.gov (United States)

    Mashingaidze, Felix; Choonara, Yahya E; Kumar, Pradeep; du Toit, Lisa C; Maharaj, Vinesh; Buchmann, Eckhart; Pillay, Viness

    2017-11-01

    In this study, an intravaginal delivery system able to deliver an anti-HIV-1 agent for the purpose of potentially reducing HIV-1 transmission acting over an extended duration was successfully formulated. This delivery system was a composite polymeric caplet comprising zidovudine-loaded polyethylene glycol enclatherated pectin-mucin submicron matrices embedded within a poly (D,L-lactide), magnesium stearate, Kollidon® SR, and Carbopol® 974P NF-based polymeric caplet matrix. A three-factor and three-level Box-Behnken statistical design was utilized to optimize the polymeric caplet. The optimized directly compressed composite polymeric caplet hardness was 22.1 ± 0.3 N and the matrix resilience was 62.4 ± 0.6%. The swelling- and diffusion-controlled fractional zidovudine (AZT) release from the optimized caplet was 0.74 ± 0.01 in simulated vaginal fluid (SVF), which increased to 0.81 ± 0.21 in phosphate-buffered saline (PBS) simulating seminal fluid, over 30 days. Caplet matrix swelling was directly related to the percentage Carbopol 974P NF composition. An intravaginal system for AZT delivery was tested in the pig model over 28 days. X-ray analysis depicted delivery system swelling with matrix contrast fading over time as vaginal fluid permeated the matrix core. Plasma, vaginal fluid swab eluates, and tissue AZT concentrations were measured by gradient ultra-performance liquid chromatography (UPLC)-tandem photodiode array detection. Vaginal tissue and vaginal fluid swab eluate AZT concentrations remained above effective levels over 28 days and were higher than plasma AZT concentrations, availing a system with reduced systemic toxicity and more effective inhibition of viral replication at the site of entry.

  12. Effect of short-term regional traffic restriction on urban submicron particulate pollution.

    Science.gov (United States)

    Zhao, Suping; Yu, Ye

    2017-05-01

    During the 2013 and 2015 Lanzhou International Marathon Events (LIME1 and LIME2), the local government made a significant effort to improve traffic conditions and air quality by implementing traffic restriction measures. To fill the gap in information on the effect of short-period (several hours) traffic control on urban air quality, submicron particle size distributions and meteorological data were measured simultaneously during June 2013 and June 2015 in urban Lanzhou. The number and surface area concentrations of particles in the 100-200nm range declined by 67.2% and 65.0% for LIME1 due to traffic control, while they decreased by 39.2% and 37.1% for LIME2. The impact of traffic restriction on air pollution near the sampling site lagged behind the traffic control period for LIME2. In addition, the effect of traffic restriction on air pollution near the sampling site was dependent on the distance between the relative orientation of the sampling site and traffic-restricted zones, as well as meteorological conditions such as wind direction. The influence of traffic restrictions on the particle concentrations differed for different particle sizes. The size range most affected by traffic restriction was 60-200 and 60-300nm for number and surface area concentrations in the urban environment, respectively, while for the particle volume concentration it was the 100-600nm range. This study will provide a basis for implementation of future urban traffic-induced particulate pollution control measures. Copyright © 2016. Published by Elsevier B.V.

  13. Computational mask defect review for contamination and haze inspections

    Science.gov (United States)

    Morgan, Paul; Rost, Daniel; Price, Daniel; Corcoran, Noel; Satake, Masaki; Hu, Peter; Peng, Danping; Yonenaga, Dean; Tolani, Vikram; Wolf, Yulian; Shah, Pinkesh

    2013-09-01

    As optical lithography continues to extend into sub-0.35 k1 regime, mask defect inspection and subsequent review has become tremendously challenging, and indeed the largest component to mask manufacturing cost. The routine use of various resolution enhancement techniques (RET) have resulted in complex mask patterns, which together with the need to detect even smaller defects due to higher MEEFs, now requires an inspection engineer to use combination of inspection modes. This is achieved in 193nm AeraTM mask inspection systems wherein masks are not only inspected at their scanner equivalent aerial exposure conditions, but also at higher Numerical Aperture resolution, and special reflected-light, and single-die contamination modes, providing better coverage over all available patterns, and defect types. Once the required defects are detected by the inspection system, comprehensively reviewing and dispositioning each defect then becomes the Achilles heel of the overall mask inspection process. Traditionally, defects have been reviewed manually by an operator, which makes the process error-prone especially given the low-contrast in the convoluted aerial images. Such manual review also limits the quality and quantity of classifications in terms of the different types of characterization and number of defects that can practically be reviewed by a person. In some ways, such manual classification limits the capability of the inspection tool itself from being setup to detect smaller defects since it often results in many more defects that need to be then manually reviewed. Paper 8681-109 at SPIE Advanced Lithography 2013 discussed an innovative approach to actinic mask defect review using computational technology, and focused on Die-to-Die transmitted aerial and high-resolution inspections. In this approach, every defect is characterized in two different ways, viz., quantitatively in terms of its print impact on wafer, and qualitatively in terms of its nature and origin in

  14. A Particle-In-Cell approach to particle flux shaping with a surface mask

    Directory of Open Access Journals (Sweden)

    G. Kawamura

    2017-08-01

    Full Text Available The Particle-In-Cell simulation code PICS has been developed to study plasma in front of a surface with two types of masks, step-type and roof-type. Parameter scans with regard to magnetic field angle, electron density, and mask height were carried out to understand their influence on ion particle flux distribution on a surface. A roof-type mask with a small mask height yields short decay length in the flux distribution which is consistent with that estimated experimentally. A roof-type mask with a large height yields very long decay length and the flux value does not depend on a mask height or an electron density, but rather on a mask length and a biasing voltage of the surface. Mask height also changes the flux distribution apart from the mask because of the shading effect of the mask. Electron density changes the distribution near the mask edge according to the Debye length. Dependence of distribution on parameters are complicated especially for a roof-type mask, and simulation study with various parameters are useful to understand the physical reasons of dependence and also is useful as a tool for experiment studies.

  15. Additive Manufacturing of Advanced High Temperature Masking Fixtures for EBPVD TBC Coating

    Energy Technology Data Exchange (ETDEWEB)

    Dehoff, Ryan R [ORNL; List III, Frederick Alyious [ORNL; Kirka, Michael M [ORNL; Carver, Keith [ORNL; Feuerstein, Albert [Praxair Inc.

    2016-03-30

    The purpose of this Manufacturing Demonstration Facility (MDF) technical collaboration project between Praxair Surface Technologies, Inc. (PST) and Oak Ridge National Laboratory (ORNL) was to develop an additive manufacturing process to fabricate next generation high temperature masking fixtures for coating of turbine airfoils with ceramic Thermal Barrier Coatings (TBC) by the Electron Beam Physical Vapor Deposition (EBPVD) process. Typical masking fixtures are sophisticated designs and require complex part manipulation in order to achieve the desired coating distribution. Fixtures are typically fabricated from high temperature nickel (Ni) based superalloys. The fixtures are fabricated from conventional processes by welding of thin sheet material into a complex geometry, to decrease the weight load for the manipulator and to reduce the thermal mass of the fixture. Recent attempts have been made in order to fabricate the fixtures through casting, but thin walled sections are difficult to cast and have high scrap rates. This project focused on understanding the potential for fabricating high temperature Ni based superalloy fixtures through additive manufacturing. Two different deposition processes; electron beam melting (EBM) and laser powder bed fusion were evaluated to determine the ideal processing route of these materials. Two different high temperature materials were evaluated. The high temperature materials evaluated were Inconel 718 and another Ni base alloy, designated throughout the remainder of this document as Alloy X, as the alloy composition is sensitive. Inconel 718 is a more widely utilized material for additive manufacturing although it is not currently the material utilized for current fixtures. Alloy X is the alloy currently used for the fixtures, but is not a commercially available alloy for additive manufacturing. Praxair determined it was possible to build the fixture using laser powder bed technology from Inconel 718. ORNL fabricated the fixture

  16. Analysis of the current density characteristics in through-mask electrochemical micromachining (TMEMM for fabrication of micro-hole arrays on invar alloy film

    Directory of Open Access Journals (Sweden)

    Da-som JIN

    2017-06-01

    Full Text Available Invar alloy consisting of 64% iron and 36% nickel has been widely used for the production of shadow masks for organic light emitting diodes (OLEDs because of its low thermal expansion coefficient (1.86 × 10−6 cm/°C. To fabricate micro-hole arrays on 30 μm invar alloy film, through-mask electrochemical micromachining (TMEMM was developed and combined with a portion of the photolithography etching process. For precise hole shapes, patterned photoresist (PR film was applied as an insulating mask. To investigate the relationship between the current density and the material removal rate, the principle of the electrochemical machining was studied with a focus on the equation. The finite element method (FEM was used to verify the influence of each parameter on the current density on the invar alloy film surface. The parameters considered were the thickness of the PR mask, inter-electrode gap (IEG, and electrolyte concentration. Design of experiments (DOE was used to figure out the contribution of each parameter. A simulation was conducted with varying parameters to figure out their relationships with the current density. Optimization was conducted to select the suitable conditions. An experiment was carried out to verify the simulation results. It was possible to fabricate micro-hole arrays on invar alloy film using TMEMM, which is a promising method that can be applied to fabrications of OLEDs shadow masks.

  17. A high aspect ratio Si-fin FinFET fabricated with 193nm scanner photolithography and thermal oxide hard mask etching techniques

    Science.gov (United States)

    Liao, Wen-Shiang

    2006-03-01

    A vertical double gate (FinFET) devices with a high Si-fin aspect ratio of height/width (H/W) = 87nm/11nm have been successfully fabricated on SOI wafers. Firstly, a 50nm-thick capping oxide layer was thermally grown upon the SOI crystalline silicon layer. Secondly, both 105nm-thick BARC and 265nm-thick photoresist were coated and a 193nm scanner lithography tool was used for the Si-fin layout patterning under high ASML exposure energy. Then, a deep sub-micron plasma etcher was used for an aggressive photoresist and BARC trimming down processing and the Si-fin capping oxide layer was subsequently plasma etched in another etching chamber without breaking the plasma etcher's loadlock vacuum. Continuously, the photoresist and BARC were removed with a plasma ashing and a RCA cleaning. Also, the patterned Si-fin capping oxide can be further trimmed down with an additional DHF cleaning and the remained ~22nm-thick capping oxide was still thick enough to act as a robust hard mask for the subsequent Si-fin plasma etching. Finally, an ultra thin Si-fin width 11nm and Si-fin height of 87nm can be successfully fabricated through the last silcon plasma etching.

  18. Soldering mask laser removal from printed circuit boards aiming copper recycling.

    Science.gov (United States)

    Raele, Marcus Paulo; De Pretto, Lucas Ramos; Zezell, Denise Maria

    2017-10-01

    Management of waste of electric and electronic equipment (WEEE) is a key issue for modern societies; furthermore, it contains valuable materials that can be recycled, especially in printed circuit boards (PCB), which have approximately one-third of their weight in copper. In this study we demonstrated the use of laser to strip the covering soldering mask on PCB's, thus exposing the copper underneath so that extraction techniques may take place. Using a Q-Switched Nd:YAG laser operating at 1064nm and 532nm we tested the procedure under different energy conditions. The laser stripping of the soldering mask was achieved with satisfactory results by irradiation with 225mJ at 1064nm. However, when using similar parameters at 532nm the process of the coating ejection was not promoted properly, leading to a faulty detachment. Infrared laser PCB stripping presents itself to be technically viable and environmental friendly, since it uses no chemicals inputs, offering one more option to WEEE treatment and recycling. Copyright © 2017 Elsevier Ltd. All rights reserved.

  19. Effect of Ceramic Thickness and Luting Agent Shade on the Color Masking Ability of Laminate Veneers.

    Science.gov (United States)

    Begum, Zubeda; Chheda, Pratik; Shruthi, C S; Sonika, Radhika

    2014-12-01

    The main objective of the study was to recognize the effect of ceramic thickness and luting agent on the extent to which the restoration masks color variations that may be present in the underlying dental structure. Two pressable ceramics were used: Lithium disilicate reinforced (IPS e.max- Ivoclar Vivadent) and Leucite reinforced (Cergo- Dentsply). Fifteen ceramic discs were manufactured from each ceramic and divided into three groups, according to the thickness (0.5, 1, 1.5 mm). To simulate the color of a dark underlying dental structure, background discs, color C3, with 20 mm diameter, were made using resin composite. The ceramic discs with varying thicknesses were seated on the dark background of the resin composite with either resinous opaque cement or resinous cement. The color parameters were determined by the CIE Lab system of colors using a spectrophotometer and color differences (ΔE) were calculated. The results were then statistically analyzed, using ANOVA test and Tukey HSD test. The ΔE values of both ceramic systems were affected by both the luting agent and the ceramic thickness (P veneers, higher values in the color parameters were obtained for both ceramic materials. The color masking ability of ceramics used for laminate veneers is significantly affected by the thickness of the ceramic and the shade of the luting agent used.

  20. Single-crystal and textured polycrystalline Nd2Fe14B flakes with a submicron or nanosize thickness

    Energy Technology Data Exchange (ETDEWEB)

    Cui, BZ; Zheng, LY; Li, WF; Liu, JF; Hadjipanayis, GC

    2012-02-01

    This paper reports on the fabrication, structure and magnetic property optimization of Nd2Fe14B single-crystal and [0 0 1] textured poly-nanocrystalline flakes prepared by surfactant-assisted high-energy ball milling (HEBM). Single-crystal Nd2Fe14B flakes first with micron and then with submicron thicknesses were formed via continuous basal cleavage along the (1 1 0) planes of the irregularly shaped single-crystal microparticles during the early stage of HEBM. With further milling, [0 0 1] textured polycrystalline submicron Nd2Fe14B flakes were formed. Finally, crystallographically anisotropic polycrystalline Nd2Fe14B nanoflakes were formed after milling for 5-6 h. Anisotropic magnetic behavior was found in all of the flake samples. Nd2Fe14B flakes prepared with either oleic acid (OA) or oleylamine (OY) as the surfactant exhibited similar morphology, structure and magnetic properties. Both the addition of some low-melting-point eutectic Nd70Cu30 alloy and an appropriate post-annealing can increase the coercivity of the Nd2Fe14B flakes. The coercivity of Nd2Fe14B nanoflakes with an addition of 16.7 wt.% Nd70Cu30 by milling for 5 h in heptane with 20 wt.% OY increased from 3.7 to 6.8 kOe after annealing at 450 degrees C for 0.5 h. The mechanism for formation and coercivity enhancement of Nd2Fe14B single-crystal and textured poly-nanocrystalline flakes with a submicron or nanosize thickness was discussed. (C) 2011 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.