Diffusion of water into SU-8 microcantilevers

DEFF Research Database (Denmark)

Liu, C.J.; Liu, Y.; Sokuler, M.

2010-01-01

We present a method to monitor the diffusion of liquid molecules in polymers. A microdrop of water is deposited by a piezoelectric drop generator onto the upper surface of a cantilever made of SU-8 based photoresist. In response, the cantilever bends in the opposite direction. We find...... sophisticated finite element model the diffusion coefficient of water in the SU-8 polymer can be determined quantitatively from the dynamics of cantilever bending....... that this bending is mainly caused by the diffusion of water into the cantilever and the consequent swelling of SU-8. Using a one-dimensional diffusion model and assuming a simple swelling law, we qualitatively model the bending of the cantilever during in and out diffusion of water in SU-8. With a more...

Innovative SU-8 Lithography Techniques and Their Applications

Directory of Open Access Journals (Sweden)

Jeong Bong Lee

2014-12-01

Full Text Available SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters high-aspect-ratio (up to 100:1 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro- and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so.

A superhydrophobic chip based on SU-8 photoresist pillars suspended on a silicon nitride membrane

KAUST Repository

Marinaro, Giovanni; Accardo, Angelo; De Angelis, Francesco; Dane, Thomas; Weinhausen, Britta; Burghammer, Manfred; Riekel, Christian

2014-01-01

We developed a new generation of superhydrophobic chips optimized for probing ultrasmall sample quantities by X-ray scattering and fluorescence techniques. The chips are based on thin Si3N4 membranes with a tailored pattern of SU-8 photoresist pillars. Indeed, aqueous solution droplets can be evaporated and concentrated at predefined positions using a non-periodic pillar pattern. We demonstrated quantitatively the deposition and aggregation of gold glyconanoparticles from the evaporation of a nanomolar droplet in a small spot by raster X-ray nanofluorescence. Further, raster nanocrystallography of biological objects such as rod-like tobacco mosaic virus nanoparticles reveals crystalline macro-domain formation composed of highly oriented nanorods. © 2014 the Partner Organisations.

A superhydrophobic chip based on SU-8 photoresist pillars suspended on a silicon nitride membrane

KAUST Repository

Marinaro, Giovanni

2014-07-28

We developed a new generation of superhydrophobic chips optimized for probing ultrasmall sample quantities by X-ray scattering and fluorescence techniques. The chips are based on thin Si3N4 membranes with a tailored pattern of SU-8 photoresist pillars. Indeed, aqueous solution droplets can be evaporated and concentrated at predefined positions using a non-periodic pillar pattern. We demonstrated quantitatively the deposition and aggregation of gold glyconanoparticles from the evaporation of a nanomolar droplet in a small spot by raster X-ray nanofluorescence. Further, raster nanocrystallography of biological objects such as rod-like tobacco mosaic virus nanoparticles reveals crystalline macro-domain formation composed of highly oriented nanorods. © 2014 the Partner Organisations.

SU-8 micropatterning for microfluidic droplet and microparticle focusing

International Nuclear Information System (INIS)

Debuisson, Damien; Senez, Vincent; Arscott, Steve

2011-01-01

We demonstrate micropatterned surfaces consisting of concentric circles and spirals which can focus an evaporating sessile droplet to a specific location on a surface. We also study the micropattern geometry to focus microparticles contained within the droplet. The micropatterned surfaces are fabricated using the photoresist SU-8. Our process enables the modification of the surface wetting via the formation of smooth trench-like defects in the SU-8 which define the micropatterns; the geometry of these micropatterns determines the droplet/microparticle focusing. It is clearly shown that the introduction of small gaps into the micropatterns promotes microparticle centring due to the modification of the depinning angle of the droplet. We also show that the use of spiral micropatterns promotes microparticle centring. Finally, microparticle focusing can be enhanced by modification of surface wetting via the addition of a thin fluorocarbon hydrophobic layer onto the SU-8

In situ SU-8 silver nanocomposites

Directory of Open Access Journals (Sweden)

Søren V. Fischer

2015-07-01

Full Text Available Nanocomposite materials containing metal nanoparticles are of considerable interest in photonics and optoelectronics applications. However, device fabrication of such materials always encounters the challenge of incorporation of preformed nanoparticles into photoresist materials. As a solution to this problem, an easy new method of fabricating silver nanocomposites by an in situ reduction of precursors within the epoxy-based photoresist SU-8 has been developed. AgNO3 dissolved in acetonitrile and mixed with the epoxy-based photoresist SU-8 forms silver nanoparticles primarily during the pre- and post-exposure soft bake steps at 95 °C. A further high-temperature treatment at 300 °C resulted in the formation of densely homogeneously distributed silver nanoparticles in the photoresist matrix. No particle growth or agglomeration of nanoparticles is observed at this point. The reported new in situ silver nanocomposite materials can be spin coated as homogeneous thin films and structured by using UV lithography. A resolution of 5 µm is achieved in the lithographic process. The UV exposure time is found to be independent of the nanoparticle concentration. The fabricated silver nanocomposites exhibit high plasmonic responses suitable for the development of new optoelectronic and optical sensing devices.

SU-8 cantilever chip interconnection

DEFF Research Database (Denmark)

Johansson, Alicia Charlotte; Janting, Jakob; Schultz, Peter

2006-01-01

The polymer SU-8 is becoming widely used for all kinds of micromechanical and microfluidic devices, not only as a photoresist but also as the constitutional material of the devices. Many of these polymeric devices need to include a microfluidic system as well as electrical connection from the ele...

MICROSTRUCTURING OF SU-8 RESIST FOR MEMS AND BIO-APPLICATIONS

OpenAIRE

Dey, P.K.; Pramanick, B.; RaviShankar, A.; Ganguly, P.; Das, S.

2017-01-01

Some studies on the fabrication of micro-needles, micro-pillers, and micro-channels using SU-8 negative photoresist for MEMS and bio-applications are reported. The SU-8 processing technology was standardized for the purpose. Micro-pillars were fabricated on SU-8 polymer by soft lithographic technique. Micro-needles were realized on SU-8 film utilizing lensing effect of the etched groove structure of the glass substrate. Micro-channel was fabricated by molding of PDMS polymer on patterned SU-8...

Silicon/SU8 multi-electrode micro-needle for in vivo neurochemical monitoring.

Science.gov (United States)

Vasylieva, Natalia; Marinesco, Stéphane; Barbier, Daniel; Sabac, Andrei

2015-10-15

Simultaneous monitoring of glucose and lactate is an important challenge for understanding brain energetics in physiological or pathological states. We demonstrate here a versatile method based on a minimally invasive single implantation in the rat brain. A silicon/SU8-polymer multi-sensing needle-shaped biosensor, was fabricated and tested. The multi-electrode array design comprises three platinum planar microelectrodes with a surface area of 40 × 200 µm(2) and a spacing of 200 µm, which were micromachined on a single 3mm long micro-needle having a 100 × 50 µm(2) cross-section for reduced tissue damage during implantation. Platinum micro-electrodes were aligned at the bottom of micro-wells obtained by photolithography on a SU8 photoresist layer. After clean room processing, each micro-electrode was functionalized inside the micro-wells by means of a micro-dispensing device, either with glucose oxidase or with lactate oxidase, which were cross-linked on the platinum electrodes. The third electrode covered with Bovine Serum Albumin (BSA) was used for the control of non-specific currents. The thick SU8 photoresist layer has revealed excellent electrical insulation of the micro-electrodes and between interconnection lines, and ensured a precise localization and packaging of the sensing enzymes on platinum micro-electrodes. During in vitro calibration with concentrations of analytes in the mM range, the micro-wells patterned in the SU8 photoresist proved to be highly effective in eliminating cross-talk signals, caused by H2O2 diffusion from closely spaced micro-electrodes. Moreover, our biosensor was successfully assayed in the rat cortex for simultaneous monitoring of both glucose and lactate during insulin and glucose administration. Copyright © 2015 Elsevier B.V. All rights reserved.

Gold Nanoparticles-Coated SU-8 for Sensitive Fluorescence-Based Detections of DNA

DEFF Research Database (Denmark)

Cao, Cuong; Birtwell, Sam W.; Høgberg, Jonas

2012-01-01

SU-8 epoxy-based negative photoresist has been extensively employed as a structural material for fabrication of numerous biological microelectro-mechanical systems (Bio-MEMS) or lab-on-a-chip (LOC) devices. However, SU-8 has a high autofluorescence level that limits sensitivity of microdevices...... for various Bio-MEMs and LOC devices that use SU-8 as a structural material....

Tailoring the mechanical properties of SU-8/clay nanocomposites: polymer microcantilever fabrication perspective

CSIR Research Space (South Africa)

Chen, H

2014-03-01

Full Text Available SU-8/Clay nanocomposite is considered as a candidate material for microcantilever sensor fabrication. Organically modified montmorillonite clay nanoparticles are dispersed in the universally used negative photoresist polymer SU-8, for a low cost...

Electroplating moulds using dry film thick negative photoresist

Science.gov (United States)

Kukharenka, E.; Farooqui, M. M.; Grigore, L.; Kraft, M.; Hollinshead, N.

2003-07-01

This paper reports on progress on the feasibility of fabricating moulds for electroplating using Ordyl P-50100 (negative) acrylate polymer based dry film photoresist, commercially available from Elga Europe (http://www.elgaeurope.it). We used this photoresist as an alternative to SU8 negative epoxy based photoresist, which is very difficult to process and remove after electroplating (Lorenz et al 1998 Microelectron. Eng. 41/42 371-4, Eyre et al 1998 Proc. MEMS'98 (Heidelberg) (Piscataway, NJ: IEEE) pp 218-22). Ordyl P-50100 is easy to work with and can be easily removed after processing. A single layer of Ordyl P-50100 was deposited by lamination up to 20 µm thickness. Thicker layers (200 µm and more) can be achieved with multilayer lamination using a manual laminator. For our applications we found that Ordyl P-50100 dry film photoresist is a very good alternative to SU8 for the realization of 100 µm high moulds. The results presented will open up new possibilities for low-cost LIGA-type processes for MEMS applications.

Functionalized SU-8 patterned with X-ray Lithography

DEFF Research Database (Denmark)

Balslev, Søren; Romanato, F.

2005-01-01

spontaneous emission light source that couples out light normal to the chip plane. In addition we examine the influence of the x-ray irradiation on the fluorescence of thin films of dye doped SU-8. The dye embedded in the SU-8 is optically excited during, characterization by an external light source tuned......In this work we demonstrate the feasibility of x-ray lithography on SU-8 photoresist doped with the laser dye Rhodamine 6G, while retaining the photoactive properties of the embedded dye. Two kinds of structures are fabricated via soft x-ray lithography and characterized: a laser and in amplified...

SU-8 Guiding Layer for Love Wave Devices

Directory of Open Access Journals (Sweden)

Michael I. Newton

2007-11-01

Full Text Available SU-8 is a technologically important photoresist used extensively for thefabrication of microfluidics and MEMS, allowing high aspect ratio structures to beproduced. In this work we report the use of SU-8 as a Love wave sensor guiding layerwhich allows the possibility of integrating a guiding layer with flow cell during fabrication.Devices were fabricated on ST-cut quartz substrates with a single-single finger design suchthat a surface skimming bulk wave (SSBW at 97.4 MHz was excited. SU-8 polymer layerswere successively built up by spin coating and spectra recorded at each stage; showing afrequency decrease with increasing guiding layer thickness. The insertion loss andfrequency dependence as a function of guiding layer thickness was investigated over thefirst Love wave mode. Mass loading sensitivity of the resultant Love wave devices wasinvestigated by deposition of multiple gold layers. Liquid sensing using these devices wasalso demonstrated; water-glycerol mixtures were used to demonstrate sensing of density-viscosity and the physical adsorption and removal of protein was also assessed usingalbumin and fibrinogen as model proteins.

Comparison of different photoresist buffer layers in SPR sensors based on D-shaped POF and gold film

Science.gov (United States)

Cennamo, Nunzio; Pesavento, Maria; De Maria, Letizia; Galatus, Ramona; Mattiello, Francesco; Zeni, Luigi

2017-04-01

A comparative analysis of two optical fiber sensing platforms is presented. The sensors are based on surface plasmon resonance (SPR) in a D-shaped plastic optical fiber (POF) with a photoresist buffer layer between the exposed POF core and the thin gold film. We show how the sensor's performances change when the photoresist layer changes. The photoresist layers proposed in this analysis are SU-8 3005 and S1813. The experimental results are congruent with the numerical studies and it is instrumental for chemical and bio-chemical applications. Usually, the photoresist layer is required in order to increase the performance of the SPR-POF sensor.

Special Issue: 15 Years of SU8 as MEMS Material

Directory of Open Access Journals (Sweden)

Arnaud Bertsch

2015-06-01

Full Text Available In 1997, the first paper using SU-8 as a material for microfabrication was published [1], demonstrating the interest of this negative photoresist for the near-UV structuration of thick layers and the manufacturing of high aspect-ratio components.[...

Microwave performance of photoresist-alumina microcomposites for batch fabrication of thick polymer-based dielectric structures

International Nuclear Information System (INIS)

Rashidian, Atabak; Klymyshyn, David M; Aligodarz, Mohammadreza Tayfeh; Boerner, Martin; Mohr, Jürgen

2012-01-01

The goal of this paper is to investigate the electrical properties of photoresist-alumina microcomposites with different portions of ceramic content. Substrates of photoresist-alumina microcomposites are fabricated and a comprehensive analysis is performed to characterize their dielectric constant and dielectric loss tangent at microwave frequencies up to 40 GHz. To evaluate the performance of these materials for microwave applications, the properties of various lithographically fabricated antenna elements are examined and analysed based on the measured electrical properties. The experimental results show that the electrical properties of the photoresist composite are nonlinearly affected by ceramic content and also a minimum percentage of ceramic portion is required to improve the electrical properties of the photoresist composite. For instance, comparison of 0 wt% with 23 wt% SU8-alumina shows that no reduction is achieved for the dielectric loss tangent. Comparison of 38 wt% with 48 wt% SU8-alumina microcomposite shows that the dielectric loss tangent is improved from 0.03 to 0.01 and the dielectric constant is increased from 3.8 to 5.0 at 25 GHz. These improvements can result in superior performance for the photoresist-based microwave components. (paper)

Microwave performance of photoresist-alumina microcomposites for batch fabrication of thick polymer-based dielectric structures

Science.gov (United States)

Rashidian, Atabak; Klymyshyn, David M.; Tayfeh Aligodarz, Mohammadreza; Boerner, Martin; Mohr, Jürgen

2012-10-01

The goal of this paper is to investigate the electrical properties of photoresist-alumina microcomposites with different portions of ceramic content. Substrates of photoresist-alumina microcomposites are fabricated and a comprehensive analysis is performed to characterize their dielectric constant and dielectric loss tangent at microwave frequencies up to 40 GHz. To evaluate the performance of these materials for microwave applications, the properties of various lithographically fabricated antenna elements are examined and analysed based on the measured electrical properties. The experimental results show that the electrical properties of the photoresist composite are nonlinearly affected by ceramic content and also a minimum percentage of ceramic portion is required to improve the electrical properties of the photoresist composite. For instance, comparison of 0 wt% with 23 wt% SU8-alumina shows that no reduction is achieved for the dielectric loss tangent. Comparison of 38 wt% with 48 wt% SU8-alumina microcomposite shows that the dielectric loss tangent is improved from 0.03 to 0.01 and the dielectric constant is increased from 3.8 to 5.0 at 25 GHz. These improvements can result in superior performance for the photoresist-based microwave components.

SU-8 doped and encapsulated n-type graphene nanomesh with high air stability

Energy Technology Data Exchange (ETDEWEB)

Al-Mumen, Haider [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States); Department of Electrical Engineering, University of Babylon, Babylon (Iraq); Dong, Lixin; Li, Wen, E-mail: wenli@egr.msu.edu [Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824 (United States)

2013-12-02

N-type doping of graphene with long-term chemical stability in air represents a significant challenge for practical application of graphene electronics. This paper reports a reversible doping method to achieve highly stable n-type graphene nanomeshes, in which the SU-8 photoresist simultaneously serves as an effective electron dopant and an excellent encapsulating layer. The chemically stable n-type characteristics of the SU-8 doped graphene were evaluated in air using their Raman spectra, electrical transport properties, and electronic band structures. The SU-8 doping does minimum damage to the hexagonal carbon lattice of graphene and is completely reversible by removing the uncrosslinked SU-8 resist.

Optimized plasma-deposited fluorocarbon coating for dry release and passivation of thin SU-8 cantilevers

DEFF Research Database (Denmark)

Keller, Stephan Urs; Häfliger, Daniel; Boisen, Anja

2008-01-01

during fluorocarbon deposition, the surface free energy of the coating can be tuned to allow for uniform wetting during spin coating of arbitrary thin SU-8 films. Further, they define an optimal pressure regime for the release of thin polymer structures at high yield. They demonstrate the successful......Plasma-deposited fluorocarbon coatings are introduced as a convenient method for the dry release of polymer structures. In this method, the passivation process in a deep reactive ion etch reactor was used to deposit hydrophobic fluorocarbon films. Standard photolithography with the negative epoxy......-based photoresist SU-8 was used to fabricate polymer structures such as cantilevers and membranes on top of the nonadhesive release layer. The authors identify the plasma density as the main parameter determining the surface properties of the deposited fluorocarbon films. They show that by modifying the pressure...

Effects of design geometry on SU8 polymer waveguides

Science.gov (United States)

Holland, Anthony S.; Balkunje, Vishal S.; Mitchell, Arnan; Austin, Michael W.; Raghunathan, Mukund K.; Kostovski, Gorgi

2005-02-01

The spin-on photoresist SU8 from MicroChem has a relatively high refractive index (n=1.57 at 1550nm) compared with other polymers. It is stable and has high optical transmission at optical communication wavelengths. In this paper we study rib waveguides fabricated using SU8 as the core layer and thermoset polymers UV15 (n=1.50 at 1550nm) from Master Bond and NOA61 (n=1.54 at 1550nm) from Gentec as the cladding layers. The rib height is varied from 0.3 to 1.7μm high. This is part of the SU8 layer sandwiched between the cladding layers. The waveguides are tested to determine the effects of varying this geometry for single mode optical transmission. The lengths of the waveguides were 1.5 cm to 5 cm.

Uniform fabrication of thick SU-8 patterns on small-sized wafers for micro-optics applications

Science.gov (United States)

Abada, S.; Reig, B.; Daran, E.; Doucet, JB; Camps, T.; Charlot, S.; Bardinal, V.

2014-05-01

This paper reports on an alternative method for precise and uniform fabrication of 100μm-thick SU-8 microstructures on small-sized or non-circular samples. Standard spin-coating of high-viscosity resists is indeed known to induce large edge beads, leading to an air gap between the mask and the SU-8 photo-resist surface during UV photolithography. This results in a non uniform thickness deposition and in a poor pattern definition. This problem becomes highly critical in the case of small-sized samples. To overcome it, we have developed a soft thermal imprint method based on the use of a nano-imprint equipment and applicable whatever sample fragility, shape and size (from 2cm to 6 inches). After final photolithography, the SU8 pattern thickness variation profile is measured. Thickness uniformity is improved from 30% to 5% with a 5μm maximal deviation to the target value over 2cm-long samples.

Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

Directory of Open Access Journals (Sweden)

Harutaka Mekaru

2015-02-01

Full Text Available In combination with tapered-trench-etching of Si and SU-8 photoresist, a grayscale mask for deep X-ray lithography was fabricated and passed a 10-times-exposure test. The performance of the X-ray grayscale mask was evaluated using the TERAS synchrotron radiation facility at the National Institute of Advanced Industrial Science and Technology (AIST. Although the SU-8 before photo-curing has been evaluated as a negative-tone photoresist for ultraviolet (UV and X-ray lithographies, the characteristic of the SU-8 after photo-curing has not been investigated. A polymethyl methacrylate (PMMA sheet was irradiated by a synchrotron radiation through an X-ray mask, and relationships between the dose energy and exposure depth, and between the dose energy and dimensional transition, were investigated. Using such a technique, the shape of a 26-μm-high Si absorber was transformed into the shape of a PMMA microneedle with a height of 76 μm, and done with a high contrast. Although during the fabrication process of the X-ray mask a 100-μm-pattern-pitch (by design was enlarged to 120 μm. However, with an increase in an integrated dose energy this number decreased to 99 μm. These results show that the X-ray grayscale mask has many practical applications. In this paper, the author reports on the evaluation results of SU-8 when used as a membrane material for an X-ray mask.

Effects of post exposure bake temperature and exposure time on SU-8 nanopattern obtained by electron beam lithography

Science.gov (United States)

Yasui, Manabu; Kazawa, Elito; Kaneko, Satoru; Takahashi, Ryo; Kurouchi, Masahito; Ozawa, Takeshi; Arai, Masahiro

2014-11-01

SU-8 is a photoresist imaged using UV rays. However, we investigated the characteristics of an SU-8 nanopattern obtained by electron beam lithography (EBL). In particular, we studied the relationship between post-exposure bake (PEB) temperature and exposure time on an SU-8 nanopattern with a focus on phase transition temperature. SU-8 residue was formed by increasing both PEB temperature and exposure time. To prevent the formation of this, Monte Carlo simulation was performed; the results of such simulation showed that decreasing the thickness of SU-8 can reduce the amount of residue from the SU-8 nanopattern. We confirmed that decreasing the thickness of SU-8 can also prevent the formation of residue from the SU-8 nanopattern with EBL.

A Review on Surface Stress-Based Miniaturized Piezoresistive SU-8 Polymeric Cantilever Sensors

Science.gov (United States)

Mathew, Ribu; Ravi Sankar, A.

2018-06-01

In the last decade, microelectromechanical systems (MEMS) SU-8 polymeric cantilevers with piezoresistive readout combined with the advances in molecular recognition techniques have found versatile applications, especially in the field of chemical and biological sensing. Compared to conventional solid-state semiconductor-based piezoresistive cantilever sensors, SU-8 polymeric cantilevers have advantages in terms of better sensitivity along with reduced material and fabrication cost. In recent times, numerous researchers have investigated their potential as a sensing platform due to high performance-to-cost ratio of SU-8 polymer-based cantilever sensors. In this article, we critically review the design, fabrication, and performance aspects of surface stress-based piezoresistive SU-8 polymeric cantilever sensors. The evolution of surface stress-based piezoresistive cantilever sensors from solid-state semiconductor materials to polymers, especially SU-8 polymer, is discussed in detail. Theoretical principles of surface stress generation and their application in cantilever sensing technology are also devised. Variants of SU-8 polymeric cantilevers with different composition of materials in cantilever stacks are explained. Furthermore, the interdependence of the material selection, geometrical design parameters, and fabrication process of piezoresistive SU-8 polymeric cantilever sensors and their cumulative impact on the sensor response are also explained in detail. In addition to the design-, fabrication-, and performance-related factors, this article also describes various challenges in engineering SU-8 polymeric cantilevers as a universal sensing platform such as temperature and moisture vulnerability. This review article would serve as a guideline for researchers to understand specifics and functionality of surface stress-based piezoresistive SU-8 cantilever sensors.[Figure not available: see fulltext.

Fabrication of raised and inverted SU8 polymer waveguides

Science.gov (United States)

Holland, Anthony S.; Mitchell, Arnan; Balkunje, Vishal S.; Austin, Mike W.; Raghunathan, Mukund K.

2005-01-01

Polymer films with high optical transmission have been investigated for making optical devices for several years. SU8 photoresist and optical adhesives have been investigated for use as thin films for optical devices, not what they were originally designed for. Optical adhesives are typically a one component thermoset polymer and are convenient to use for making thin film optical devices such as waveguides. They are prepared in minutes as thin films unlike SU8, which has to be carefully thermally cured over several hours for optimum results. However SU8 can be accurately patterned to form the geometry of structures required for single mode optical waveguides. SU8 in combination with the lower refractive index optical adhesive films such as UV15 from Master Bond are used to form single and multi mode waveguides. SU8 is photopatternable but we have also used dry etching of the SU8 layer or the other polymer layers e.g. UV15 to form the ribs, ridges or trenches required to guide single modes of light. Optical waveguides were also fabricated using only optical adhesives of different refractive indices. The resolution obtainable is poorer than with SU8 and hence multi mode waveguides are obtained. Loss measurements have been obtained for waveguides of different geometries and material combinations. The process for making polymer waveguides is demonstrated for making large multi mode waveguides and microfluidic channels by scaling the process up in size.

Invisible Security Printing on Photoresist Polymer Readable by Terahertz Spectroscopy

Directory of Open Access Journals (Sweden)

Hee Jun Shin

2017-12-01

Full Text Available We experimentally modulate the refractive index and the absorption coefficient of an SU-8 dry film in the terahertz region by UV light (362 nm exposure with time dependency. Consequently, the refractive index of SU-8 film is increased by approximately 6% after UV light exposure. Moreover, the absorption coefficient also changes significantly. Using the reflective terahertz imaging technique, in addition, we can read security information printed by UV treatment on an SU-8 film that is transparent in the visible spectrum. From these results, we successfully demonstrate security printing and reading by using photoresist materials and the terahertz technique. This investigation would provide a new insight into anti-counterfeiting applications in fields that need security.

Bi cluster-assembled interconnects produced using SU8 templates

International Nuclear Information System (INIS)

Partridge, J G; Matthewson, T; Brown, S A

2007-01-01

Bi clusters with an average diameter of 25 nm have been deposited from an inert gas aggregation source and assembled into thin-film interconnects which are formed between planar electrical contacts and supported on Si substrates passivated with Si 3 N 4 or thermally grown oxide. A layer of SU8 (a negative photoresist based on EPON SU-8 epoxy resin) is patterned using optical or electron-beam lithography, and it defines the position and dimensions of the cluster film. The conduction between the contacts is monitored throughout the deposition/assembly process, and subsequent I(V) characterization is performed in situ. Bi cluster-assembled interconnects have been fabricated with nanoscale widths and with up to 1:1 thickness:width aspect ratios. The conductivity of these interconnects has been increased, post-deposition, using a simple thermal annealing process

Novel method for chemical modification and patterning of the SU-8 photoresist

DEFF Research Database (Denmark)

Blagoi, Gabriela; Keller, Stephan Urs; Boisen, Anja

2007-01-01

the wetting behaviour of SU-8. The resolution limit of the AQ photopatterning method was 20 μm when using an uncollimated light source. AQ modification followed by a reaction with amino groups of Alexa-647 cadaverine and a Biotin-amino derivative proved possible modification and patterning of polymeric...

MWP phase shifters integrated in PbS-SU8 waveguides.

Science.gov (United States)

Hervás, Javier; Suárez, Isaac; Pérez, Joaquín; Cantó, Pedro J Rodríguez; Abargues, Rafael; Martínez-Pastor, Juan P; Sales, Salvador; Capmany, José

2015-06-01

We present new kind of microwave phase shifters (MPS) based on dispersion of PbS colloidal quantum dots (QDs) in commercially available photoresist SU8 after a ligand exchange process. Ridge PbS-SU8 waveguides are implemented by integration of the nanocomposite in a silicon platform. When these waveguides are pumped at wavelengths below the band-gap of the PbS QDs, a phase shift in an optically conveyed (at 1550 nm) microwave signal is produced. The strong light confinement produced in the ridge waveguides allows an improvement of the phase shift as compared to the case of planar structures. Moreover, a novel ridge bilayer waveguide composed by a PbS-SU8 nanocomposite and a SU8 passive layer is proposed to decrease the propagation losses of the pump beam and in consequence to improve the microwave phase shift up to 36.5° at 25 GHz. Experimental results are reproduced by a theoretical model based on the slow light effect produced in a semiconductor waveguide due to the coherent population oscillations. The resulting device shows potential benefits respect to the current MPS technologies since it allows a fast tunability of the phase shift and a high level of integration due to its small size.

A Novel, Aqueous Surface Treatment To Thermally Stabilize High Resolution Positive Photoresist Images*

Science.gov (United States)

Grunwald, John J.; Spencer, Allen C.

1986-07-01

The paper describes a new approach to thermally stabilize the already imaged profile of high resolution positive photoresists such as ULTRAMAC" PR-914. ***XD-4000, an aqueous emulsion of a blend of fluorine-bearing compounds is spun on top of the developed, positive photoresist-imaged wafer, and baked. This allows the photoresist to withstand temperatures up to at least 175 deg. C. while essentially maintaining vertical edge profiles. Also, adverse effects of "outgassing" in harsh environments, ie., plasma and ion implant are greatly minimized by allowing the high resolution imaged photoresist to be post-baked at "elevated" temperatures. Another type of product that accomplishes the same effect is ***XD-4005, an aqueous emulsion of a high temperature-resistant polymer. While the exact mechanism is yet to be identified, it is postulated that absorption of the "polymeric" species into the "skin" of the imaged resist forms a temperature resistant "envelope", thereby allowing high resolution photoresists to also serve in a "high temperature" mode, without reticulation, or other adverse effects due to thermal degradation. SEM's are presented showing imaged ULTRAMAC" PR-914 and ULTRAMAC" **EPA-914 geometries coated with XD-4000 or XD-4005 and followed by plasma etched oxide,polysilicon and aluminum. Selectivity ratios are compared with and without the novel treatment and are shown to be significantly better with the treatment. The surface-treated photoresist for thermal resistance remains easily strippable in solvent-based or plasma media, unlike photoresists that have undergone "PRIST" or other gaseous thermal stabilization methods.

PMMA to SU-8 bonding for polymer based lab-on-a-chip systems with integrated optics

DEFF Research Database (Denmark)

Olsen, Brian Bilenberg; Nielsen, Theodor; Clausen, Bjarne Hans

2004-01-01

We present an adhesive bonding technique developed for SU-8 based "lab-on-a-chip"- systems with integrated optical components. Microfluidic channels and optical components (e.g. wave-guides) are defined in SU-8 photoresist on a Pyrex glass substrate. The microfluidic channels are sealed by a second...... Pyrex substrate, bonded on top of the cross-linked SU-8 structure using an inter- mediate layer of 950K molecular weight poly-methylmethacrylate (PMMA). Due to a lower refractive index of PMMA, this bonding technique offers optical waveguiding in the SU-8 structures in combination with good sealing...... of the microfluidic channels. The bonding technique is investigated with respect to bonding temperature in the range of 50 - 150 degr. C and at bonding forces of 1000 N and 2000 N on a 4-inch wafer. A maximum bonding strength of 16 MPa is achieved for the PMMA to SU-8 bonding at a bonding temperature of 110 degr. C...

Suspended microstructures of epoxy based photoresists fabricated with UV photolithography

DEFF Research Database (Denmark)

Hemanth, Suhith; Anhøj, Thomas Aarøe; Caviglia, Claudia

2017-01-01

In this work we present an easy, fast, reliable and low cost microfabrication technique for fabricating suspended microstructures of epoxy based photoresistswith UV photolithography. Two different fabrication processes with epoxy based resins (SU-8 and mr-DWL) using UV exposures at wavelengths...... of 313 nm and 405 nm were optimized and compared in terms of structural stability, control of suspended layer thickness and resolution limits. A novel fabrication process combining the two photoresists SU-8 and mr-DWL with two UV exposures at 365 nm and 405 nm respectively provided a wider processing...... window for definition of well-defined suspended microstructures with lateral dimensions down to 5 μmwhen compared to 313 nm or 365 nm UV photolithography processes....

Direct injection in organic SU8 nanowires and nanotubes for waveguiding properties investigation

Science.gov (United States)

Bigeon, J.; Huby, N.; Duvail, Jean-Luc; Bêche, Bruno

2014-05-01

We report photonic concepts related to injection and sub-wavelength propagation in nanofibers (nanowires and nanotubes). These nanostructures are fabricated by the wetting template method leading to aspect ratio of over 250. At first, injection into nanowires and nanotubes of SU8, a photoresist used for integrated photonics, was successfully achieved by using polymer microlensed fibers with sub-micronic radius of curvature. Theoret- ical simulation by finite domain time-dependent (FDTD) method was used to determine the sub-wavelength propagation for nanowires and nanotubes and corroborate this coupling phenomena. The original confinement of energy density into SU8 nanotubes is highlighted. Finally, characterisation of propagation losses is reported by using a cut-back method transposed to such nanotubes and determined to range between 1 and 2 dB/mm. Both injection and cut-back method developed here are compatible with any sub-micronic structures. This work on SU8 nanofibers suggests broader perspectives for future nanophotonics.

SU-8 Lenses: Simple Methods of Fabrication and Application in Optical Interconnection Between Fiber/LED and Microstructures

Science.gov (United States)

Nguyen, Minh-Hang; Nguyen, Hai-Binh; Nguyen, Tuan-Hung; Vu, Xuan-Manh; Lai, Jain-Ren; Tseng, Fan-Gang; Chen, Te-Chang; Lee, Ming-Chang

2016-05-01

This paper presents two facile methods to fabricate off-plane lenses made of SU-8, an epoxy-based negative photoresist from MicroChem, on glass for optical interconnection. The methods allow the fabrication of lenses with flexible spot size and focal length depending on SU-8 well size and SU-8 drop volume and viscosity. In the first method, SU-8 drops were applied directly into patterned SU-8 wells with Teflon-coated micropipettes, and were baked to become (a)-spherical lenses. The lens shape and size were mainly determined by SU-8 viscosity, ratio of drop volume to well volume, and baking temperature and time. In the second method, a glass substrate with SU-8 patterned wells was emerged in diluted SU-8, then drawn up and baked to form lenses. The lens shapes and sizes were mainly determined by SU-8 viscosity and well volume. By the two methods, SU-8 lenses were successfully fabricated with spot sizes varying in range from micrometers to hundred micrometers, and focal lengths varying in range of several millimeters, depending on the lens rim diameters and aspheric sag height. Besides, on-plane SU-8 lenses were fabricated by photolithography to work in conjunction with the off-plane SU-8 lenses. The cascaded lenses produced light spots reduced to several micrometers, and they can be applied as a coupler for light coupling from fiber/Light-emitting diode (LED) to microstructures and nanostructures. The results open up the path for fabricating novel optical microsystems for optical communication and optical sensing applications.

Improving wettability of photo-resistive film surface with plasma surface modification for coplanar copper pillar plating of IC substrates

International Nuclear Information System (INIS)

Xiang, Jing; Wang, Chong; Chen, Yuanming; Wang, Shouxu; Hong, Yan; Zhang, Huaiwu; Gong, Lijun; He, Wei

2017-01-01

Highlights: • Air atmosphere plasmacould generatehydrophilic groups of photo-resistive film. • Better wettability of photo-resistive filmled tohigher plating uniformity of copper pillars. • New flow isreduced cost, simplified process and elevated productivity. - Abstract: The wettability of the photo-resistive film (PF) surfaces undergoing different pretreatments including the O_2−CF_4 low-pressure plasma (OCLP) and air plasma (AP), is investigated by water contact angle measurement instrument (WCAMI) before the bottom-up copper pillar plating. Chemical groups analysis performed by attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectra (XPS) shows that after the OCLP and wash treatment, the wettability of PF surface is attenuated, because embedded fluorine and decreased oxygen content both enhance hydrophobicity. Compared with OCLP treatment, the PF surface treatment by non-toxic air plasma displays features of C−O, O−C=O, C=O and −NO_2 by AIR-FTIR and XPS, and a promoted wettability by WCAM. Under the identical electroplating condition, the surface with a better wettability allows electrolyte to spontaneously soak all the places of vias, resulting in improved copper pillar uniformity. Statistical analysis of metallographic data shows that more coplanar and flat copper pillars are achieved with the PF treatment of air plasma. Such modified copper-pillar-plating technology meets the requirement of accurate impedance, the high density interconnection for IC substrates.

Solubility studies of inorganic–organic hybrid nanoparticle photoresists with different surface functional groups

KAUST Repository

Li, Li

2016-01-01

© 2016 The Royal Society of Chemistry. The solubility behavior of Hf and Zr based hybrid nanoparticles with different surface ligands in different concentrations of photoacid generator as potential EUV photoresists was investigated in detail. The nanoparticles regardless of core or ligand chemistry have a hydrodynamic diameter of 2-3 nm and a very narrow size distribution in organic solvents. The Hansen solubility parameters for nanoparticles functionalized with IBA and 2MBA have the highest contribution from the dispersion interaction than those with tDMA and MAA, which show more polar character. The nanoparticles functionalized with unsaturated surface ligands showed more apparent solubility changes after exposure to DUV than those with saturated ones. The solubility differences after exposure are more pronounced for films containing a higher amount of photoacid generator. The work reported here provides material selection criteria and processing strategies for the design of high performance EUV photoresists.

Improving wettability of photo-resistive film surface with plasma surface modification for coplanar copper pillar plating of IC substrates

Energy Technology Data Exchange (ETDEWEB)

Xiang, Jing; Wang, Chong; Chen, Yuanming; Wang, Shouxu; Hong, Yan; Zhang, Huaiwu [State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054 (China); Gong, Lijun [Research and Development Department, Guangzhou Fastprint Circuit Tech Co., Ltd., Guangzhou 510663 (China); He, Wei, E-mail: heweiz@uestc.edu.cn [State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054 (China); Research and Development Department, Guangdong Guanghua Sci-Tech Co., Ltd., Shantou 515000 (China)

2017-07-31

Highlights: • Air atmosphere plasmacould generatehydrophilic groups of photo-resistive film. • Better wettability of photo-resistive filmled tohigher plating uniformity of copper pillars. • New flow isreduced cost, simplified process and elevated productivity. - Abstract: The wettability of the photo-resistive film (PF) surfaces undergoing different pretreatments including the O{sub 2}−CF{sub 4} low-pressure plasma (OCLP) and air plasma (AP), is investigated by water contact angle measurement instrument (WCAMI) before the bottom-up copper pillar plating. Chemical groups analysis performed by attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectra (XPS) shows that after the OCLP and wash treatment, the wettability of PF surface is attenuated, because embedded fluorine and decreased oxygen content both enhance hydrophobicity. Compared with OCLP treatment, the PF surface treatment by non-toxic air plasma displays features of C−O, O−C=O, C=O and −NO{sub 2} by AIR-FTIR and XPS, and a promoted wettability by WCAM. Under the identical electroplating condition, the surface with a better wettability allows electrolyte to spontaneously soak all the places of vias, resulting in improved copper pillar uniformity. Statistical analysis of metallographic data shows that more coplanar and flat copper pillars are achieved with the PF treatment of air plasma. Such modified copper-pillar-plating technology meets the requirement of accurate impedance, the high density interconnection for IC substrates.

Use of SU8 as a stable and biocompatible adhesion layer for gold bioelectrodes.

Science.gov (United States)

Matarèse, Bruno F E; Feyen, Paul L C; Falco, Aniello; Benfenati, Fabio; Lugli, Paolo; deMello, John C

2018-04-03

Gold is the most widely used electrode material for bioelectronic applications due to its high electrical conductivity, good chemical stability and proven biocompatibility. However, it adheres only weakly to widely used substrate materials such as glass and silicon oxide, typically requiring the use of a thin layer of chromium between the substrate and the metal to achieve adequate adhesion. Unfortunately, this approach can reduce biocompatibility relative to pure gold films due to the risk of the underlying layer of chromium becoming exposed. Here we report on an alternative adhesion layer for gold and other metals formed from a thin layer of the negative-tone photoresist SU-8, which we find to be significantly less cytotoxic than chromium, being broadly comparable to bare glass in terms of its biocompatibility. Various treatment protocols for SU-8 were investigated, with a view to attaining high transparency and good mechanical and biochemical stability. Thermal annealing to induce partial cross-linking of the SU-8 film prior to gold deposition, with further annealing after deposition to complete cross-linking, was found to yield the best electrode properties. The optimized glass/SU8-Au electrodes were highly transparent, resilient to delamination, stable in biological culture medium, and exhibited similar biocompatibility to glass.

Micromechanical testing of SU-8 cantilevers

OpenAIRE

Hopcroft, M; Kramer, T; Kim, G; Takashima, K; Higo, Y; Moore, D; Brugger, J

2005-01-01

SU-8 is a photoplastic polymer with a wide range of possible applications in microtechnology. Cantilevers designed for atomic force microscopes were fabricated in SU-8. The mechanical properties of these cantilevers were investigated using two microscale testing techniques: contact surface profilometer beam deflection and static load deflection at a point on the beam using a specially designed test machine. The SU-8 Young's modulus value from the microscale test methods is approximately 2-3 GPa.

Injection and waveguiding properties in SU8 nanotubes for sub-wavelength regime propagation and nanophotonics integration

Science.gov (United States)

Bigeon, John; Huby, Nolwenn; Duvail, Jean-Luc; Bêche, Bruno

2014-04-01

We report photonic concepts related to injection and sub-wavelength propagation in nanotubes, an unusual but promising geometry for highly integrated photonic devices. Theoretical simulation by the finite domain time-dependent (FDTD) method was first used to determine the features of the direct light injection and sub-wavelength propagation regime within nanotubes. Then, the injection into nanotubes of SU8, a photoresist used for integrated photonics, was successfully achieved by using polymer microlensed fibers with a sub-micronic radius of curvature, as theoretically expected from FDTD simulations. The propagation losses in a single SU8 nanotube were determined by using a comprehensive set-up and a protocol for optical characterization. The attenuation coefficient has been evaluated at 1.25 dB mm-1 by a cut-back method transposed to such nanostructures. The mechanisms responsible for losses in nanotubes were identified with FDTD theoretical support. Both injection and cut-back methods developed here are compatible with any sub-micronic structures. This work on SU8 nanotubes suggests broader perspectives for future nanophotonics.

High temperature SU-8 pyrolysis for fabrication of carbon electrodes

DEFF Research Database (Denmark)

Hassan, Yasmin Mohamed; Caviglia, Claudia; Hemanth, Suhith

2017-01-01

In this work, we present the investigation of the pyrolysis parameters at high temperature (1100 °C) for the fabrication of two-dimensional pyrolytic carbon electrodes. The electrodes were fabricated by pyrolysis of lithographically patterned negative epoxy based photoresist SU-8. A central...... composite experimental design was used to identify the influence of dwell time at the highest pyrolysis temperature and heating rate on electrical, electrochemical and structural properties of the pyrolytic carbon: Van der Pauw sheet resistance measurements, cyclic voltammetry, electrochemical impedance...... spectroscopy and Raman spectroscopy were used to characterize the pyrolytic carbon. The results show that the temperature increase from 900 °C to 1100 °C improves the electrical and electrochemical properties. At 1100 °C, longer dwell time leads to lower resistivity, while the variation of the pyrolysis...

Large-core single-mode rib SU8 waveguide using solvent-assisted microcontact molding.

Science.gov (United States)

Huang, Cheng-Sheng; Wang, Wei-Chih

2008-09-01

This paper describes a novel fabrication technique for constructing a polymer-based large-core single-mode rib waveguide. A negative tone SU8 photoresist with a high optical transmission over a large wavelength range and stable mechanical properties was used as a waveguide material. A waveguide was constructed by using a polydimethylsiloxane stamp combined with a solvent-assisted microcontact molding technique. The effects on the final pattern's geometry of four different process conditions were investigated. Optical simulations were performed using beam propagation method software. Single-mode beam propagation was observed at the output of the simulated waveguide as well as the actual waveguide through the microscope image.

Decisive factors affecting plasma resistance and roughness formation in ArF photoresist

Energy Technology Data Exchange (ETDEWEB)

Jinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Samukawa, Seiji [Institute of Fluid Science, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577 (Japan); Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi [Yokohama Research Laboratories, Mitsubishi Rayon Co., Ltd, 10-1 Daikoku-cho, Tsurumi-ku, Yokohama 230-0053 (Japan); Momose, Hikaru, E-mail: samukawa@ifs.tohoku.ac.j [Corporate Research Laboratories, Mitsubishi Rayon Co., Ltd, 2-1 Miyuki-cho, Otake, Hiroshima 739-0693 (Japan)

2010-10-06

Low plasma resistance and roughness formation in an ArF photoresist are serious issues in plasma processes. To resolve these issues, we investigated several factors that affect the roughness formation and plasma resistance in an ArF photoresist. We used our neutral beam process to categorize the effects of species from the plasma on the ArF photoresist into physical bombardment, chemical reactions and ultraviolet/vacuum ultraviolet (UV/VUV) radiation. The UV/VUV radiation drastically increased the etching rates of the ArF photoresist films, and, in contrast, chemical reactions increased the formation of surface roughness. FTIR analysis indicated that the UV/VUV radiation preferentially dissociates C-H bonds in the ArF photoresist, rather than C=O bonds, because of the dissociation energies of the bonds. This indicated that the etching rates of the ArF photoresist are determined by the UV/VUV radiation because this radiation can break C-H bonds, which account for the majority of structures in the ArF photoresist. In contrast, FTIR analysis showed that chemical species such as radicals and ions were likely to react with C=O bonds, in particular C=O bonds in the lactone groups of the ArF photoresist, due to the structural and electronic effects of the lactone groups. As a result, the etching rates of the ArF photoresist can vary in different bond structures, leading to increased surface roughness in the ArF photoresist.

Surface Functionalization of Epoxy-Resist- Based Microcantilevers with Iron Oxide Nanocrystals

DEFF Research Database (Denmark)

Ingrosso, Chiara; Sardella, E.; Keller, Stephan Sylvest

2010-01-01

A functionalization procedure is integrated in the fabrication of micromechanical SU-8 cantilevers in order to chemically bind organic-capped Fe2O3 NCs at the photoresist surface, under visible light, ambient atmosp here and room temperature. The achieved highly interconnected NC multilayer netwo...... is demonstrated an active layer for real-time detection of acetone vapor molecules....

Chemical synthesis on SU-8

DEFF Research Database (Denmark)

Qvortrup, Katrine; Taveras, Kennedy; Thastrup, Ole

2011-01-01

In this paper we describe a highly effective surface modification of SU-8 microparticles, the attachment of appropriate linkers for solid-supported synthesis, and the successful chemical modification of these particles via controlled multi-step organic synthesis leading to molecules attached...

RAFT technology for the production of advanced photoresist polymers

Science.gov (United States)

Sheehan, Michael T.; Farnham, William B.; Okazaki, Hiroshi; Sounik, James R.; Clark, George

2008-03-01

Reversible Addition Fragmentation Chain Transfer (RAFT) technology has been developed for use in producing high yield low polydispersity (PD) polymers for many applications. RAFT technology is being used to produce low PD polymers and to allow control of the polymer architecture. A variety of polymers are being synthesized for use in advanced photoresists using this technique. By varying the RAFT reagent used we can modulate the system reactivity of the RAFT reagent and optimize it for use in acrylate or methacrylate monomer systems (193 and 193i photoresist polymers) or for use in styrenic monomer systems (248 nm photoresist polymers) to achieve PD as low as 1.05. RAFT polymerization technology also allows us to produce block copolymers using a wide variety of monomers. These block copolymers have been shown to be useful in self assembly polymer applications to produce unique and very small feature sizes. The mutual compatibilities of all the components within a single layer 193 photoresist are very important in order to achieve low LWR and low defect count. The advent of immersion imaging demands an additional element of protection at the solid/liquid interface. We have used RAFT technology to produce block copolymers comprising a random "resist" block with composition and size based on conventional dry photoresist materials, and a "low surface energy" block for use in 193i lithography. The relative block lengths and compositions may be varied to tune solution behavior, surface energy, contact angles, and solubility in developer. The use of this technique will be explored to produce polymers used in hydrophobic single layer resists as well as additives compatible with the main photoresist polymer.

Enhanced Response Speed of ZnO Nanowire Photodetector by Coating with Photoresist

Directory of Open Access Journals (Sweden)

Xing Yang

2016-01-01

Full Text Available Spin-coating photoresist film on ZnO nanowire (NW was introduced into the fabrication procedure to improve photoresponse and recovery speed of a ZnO NW ultraviolet photoelectric detector. A ZnO NW was first assembled on prefabricated electrodes by dielectrophoresis. Then, photoresist was spin-coated on the nanowire. Finally, a metal layer was electrodeposited on the nanowire-electrode contacts. The response properties and I-V characteristics of ZnO NW photodetector were investigated by measuring the electrical current under different conditions. Measurement results demonstrated that the detector has an enhanced photoresponse and recovery speed after coating the nanowire with photoresist. The photoresponse and recovery characteristics of detectors with and without spin-coating were compared to demonstrate the effects of photoresist and the enhancement of response and recovery speed of the photodetector is ascribed to the reduced surface absorbed oxygen molecules and binding effect on the residual oxygen molecules after photoresist spin-coating. The results demonstrated that surface coating may be an effective and simple way to improve the response speed of the photoelectric device.

Low-cost multilevel microchannel lab on chip: DF- 1000 series dry film photoresist as a promising enabler

OpenAIRE

Courson , Rémi; Cargou , Sébastien; Conédéra , Véronique; Fouet , Marc; Blatché , Charline; Serpentini , C.L.; Gué , Anne-Marie

2014-01-01

International audience; We demonstrate the use of a novel dry film photoresist DF-1000 series for the fabrication of multilevel microfluidic devices by combining a standard lithography technique and lamination technology. The optimization of the technological process enables achievement of high aspect ratio structures: 7 : 1 for free standing structures and 5 : 1 for channel structures. We proved that DF films feature a low autofluorescence level, similar to that of the SU-8 resist and compat...

Photoresist removal using gaseous sulfur trioxide cleaning technology

Science.gov (United States)

Del Puppo, Helene; Bocian, Paul B.; Waleh, Ahmad

1999-06-01

A novel cleaning method for removing photoresists and organic polymers from semiconductor wafers is described. This non-plasma method uses anhydrous sulfur trioxide gas in a two-step process, during which, the substrate is first exposed to SO3 vapor at relatively low temperatures and then is rinsed with de-ionized water. The process is radically different from conventional plasma-ashing methods in that the photoresist is not etched or removed during the exposure to SO3. Rather, the removal of the modified photoresist takes place during the subsequent DI-water rinse step. The SO3 process completely removes photoresist and polymer residues in many post-etch applications. Additional advantages of the process are absence of halogen gases and elimination of the need for other solvents and wet chemicals. The process also enjoys a very low cost of ownership and has minimal environmental impact. The SEM and SIMS surface analysis results are presented to show the effectiveness of gaseous SO3 process after polysilicon, metal an oxide etch applications. The effects of both chlorine- and fluorine-based plasma chemistries on resist removal are described.

Photoresist thin-film effects on alignment process capability

Science.gov (United States)

Flores, Gary E.; Flack, Warren W.

1993-08-01

Two photoresists were selected for alignment characterization based on their dissimilar coating properties and observed differences on alignment capability. The materials are Dynachem OFPR-800 and Shipley System 8. Both photoresists were examined on two challenging alignment levels in a submicron CMOS process, a nitride level and a planarized second level metal. An Ultratech Stepper model 1500 which features a darkfield alignment system with a broadband green light for alignment signal detection was used for this project. Initially, statistically designed linear screening experiments were performed to examine six process factors for each photoresist: viscosity, spin acceleration, spin speed, spin time, softbake time, and softbake temperature. Using the results derived from the screening experiments, a more thorough examination of the statistically significant process factors was performed. A full quadratic experimental design was conducted to examine viscosity, spin speed, and spin time coating properties on alignment. This included a characterization of both intra and inter wafer alignment control and alignment process capability. Insight to the different alignment behavior is analyzed in terms of photoresist material properties and the physical nature of the alignment detection system.

Investigation of a novel approach for the cross-linking characterization of SU-8 photoresist materials by means of optical dispersion measurements

Science.gov (United States)

Taudt, Ch.; Baselt, T.; Koch, E.; Hartmann, P.

2014-03-01

The increase in efficiency and precision in the production of semiconductor structures under the use of polymeric materials like SU-8 is crucial in securing the technological innovation within this industry. The manufacturing of structures on wafers demands a high quality of materials, tools and production processes. In particular, deviations in the materials' parameters (e.g. cross-linking state, density or mechanical properties) could lead to subsequent problems such as a reduced lifetime of structures and systems. In particular problems during the soft and post-exposure bake process can lead to an inhomogeneous distribution of material properties. This paper describes a novel approach for the characterization of SU-8 material properties in relation to a second epoxy-based material of different cross-linking by the measurement of optical dispersion within the material. A white-light interferometer was used. In particular the setup consisted of a white-light source, a Michelson-type interferometer and a spectrometer. The investigation of the dispersion characteristics was carried out by the detection of the equalization wavelength for different positions of the reference arm in a range from 400 to 900 nm. The measured time delay due to dispersion ranges from 850 to 1050 ps/m. For evaluation purposes a 200μm SU-8 sample was characterized in the described setup regarding its dispersion characteristics in relation to bulk epoxy material. The novel measurement approach allowed a fast and high-resolution material characterization for SU-8 micro structures which was suitable for integration in production lines. The outlook takes modifications of the experimental setup regarding on-wafer measurements into account.

Photochemical modification and patterning of SU-8 using Anthraquinone photolinkers

DEFF Research Database (Denmark)

Blagoi, Gabriela; Keller, Stephan Urs; Persson, Karl Fredrik

2008-01-01

-dimensional patterns on a Novolac A derivative polymer (SU-8) and, subsequently, their functionalization with biomolecules. Anthraquinone (AQ) derivatives are used to chemically modify and pattern SU-8 surfaces. Features as small as 20 μm are obtained when using uncollimated light. The X−Y spatial resolution...

On SU(8)sub(L)xSU(8)sub(R) grand unified model

International Nuclear Information System (INIS)

Pirogov, Yu.F.

1981-01-01

A set of general propositions is considered which ground the choice of the SU(8)sub(L)xSU(8)sub(R) group as a unified symmetry group. According to these propositions the group SU(8)sub(L)xSU(8)sub(R) is the most natural unified group, it is the maximal symmetry group of the kinetic term of the lagrangian single family which conserves the fermion number. A new principle is introduced. According to this principle, the mirror doubling of the fermion spectrum, necessary for renormalizability of the given unified model is, on the other hand, a manifestation of the extended conformal invariance at short distances [ru

SU-8 Composite Based “Lube-tape” for a Wide Range of Tribological Applications

Directory of Open Access Journals (Sweden)

Prabakaran Saravanan

2014-05-01

Full Text Available In a previous work, we have developed a perflouropolyether (PFPE lubricant droplet-filled SU-8 composite which promotes bonding between the molecules of SU-8 and PFPE and provides excellent boundary lubrication. The SU-8 + PFPE composite has enhanced the wear durability of SU-8 by more than four orders of magnitude. In this work, the same SU-8 + PFPE composite was used to fabricate a stand-alone laminate film called “Lube-tape”. It has integrated two layers of approximately 90 microns thickness each; the top layer is made of SU-8 + PFPE composite and the bottom layer of pristine SU-8. Thus, a single tape can have drastically contrasting high friction and low friction properties on its two surfaces. The composite side has the initial coefficient of friction ~7 times lower and the wear life more than four orders of magnitude than those of the pristine SU-8 side. This lube tape can be used on any load bearing surface to improve the tribological performance by simply pasting the pristine SU-8 side onto the substrate.

Surface modification of SU-8 for metal/SU-8 adhesion using RF plasma treatment for application in thermopile detectors

International Nuclear Information System (INIS)

Ashraf, Shakeel; Mattsson, Claes G; Thungström, Göran; Fondell, Mattis; Lindblad, Andreas

2015-01-01

This article reports on plasma treatment of SU-8 epoxy in order to enhance adhesive strength for metals. Its samples were fabricated on standard silicon wafers and treated with (O 2 and Ar) RF plasma at a power of 25 W at a low pressure of (3 × 10 −3 Torr) for different time spans (10–70 s). The sample surfaces were characterized in terms of contact angle, surface (roughness and chemistry) and using a tape test. During the contact angle measurement, it was observed that the contact angle was reduced from 73° to 5° (almost wet) and 23° for (O 2 and Ar) treated samples, respectively. The root mean square surface roughness was significantly increased by 21.5% and 37.2% for (O 2 and Ar) treatment, respectively. A pattern of metal squares was formed on the samples using photolithography for a tape test. An adhesive tape was applied to the samples and peeled off at 180°. The maximum adhesion results, more than 90%, were achieved for the O 2 -treated samples, whereas the Ar-treated samples showed no change. The XPS study shows the formation of new species in the O 2 -treated sample compared to the Ar-treated samples. The high adhesive results were due to the formation of hydrophilic groups and new O 2 species in the O 2 -treated samples, which were absent in Ar-treated samples. (paper)

A high aspect ratio SU-8 fabrication technique for hollow microneedles for transdermal drug delivery and blood extraction

Science.gov (United States)

Chaudhri, Buddhadev Paul; Ceyssens, Frederik; De Moor, Piet; Van Hoof, Chris; Puers, Robert

2010-06-01

Protein drugs, e.g. hormonal drugs, cannot be delivered orally to a patient as they get digested in the gastro-intestinal (GI) tract. Thus, it is imperative that these kinds of drugs are delivered transdermally through the skin. To provide for real-time feedback as well as to test independently for various substances in the blood, we also need a blood sampling system. Microneedles can perform both these functions. Further, microneedles made of silicon or metal have the risk of breaking inside the skin thereby leading to complications. SU-8, being approved of as being biocompatible by the Food and Drug Agency (FDA) of the United States, is an attractive alternative because firstly it is a polymer material, thereby reducing the chances of breakages inside the skin, and secondly it is a negative photoresist, thereby leading to ease of fabrication. Thus, here we present very tall (around 1600 µm) SU-8 polymer-based hollow microneedles fabricated by a simple and repeatable process, which are a very good candidate for transdermal drug delivery as well as blood extraction. The paper elaborates on the details that allow the fabrication of such extreme aspect ratios (>100).

A high aspect ratio SU-8 fabrication technique for hollow microneedles for transdermal drug delivery and blood extraction

International Nuclear Information System (INIS)

Chaudhri, Buddhadev Paul; Ceyssens, Frederik; Van Hoof, Chris; Puers, Robert; De Moor, Piet

2010-01-01

Protein drugs, e.g. hormonal drugs, cannot be delivered orally to a patient as they get digested in the gastro-intestinal (GI) tract. Thus, it is imperative that these kinds of drugs are delivered transdermally through the skin. To provide for real-time feedback as well as to test independently for various substances in the blood, we also need a blood sampling system. Microneedles can perform both these functions. Further, microneedles made of silicon or metal have the risk of breaking inside the skin thereby leading to complications. SU-8, being approved of as being biocompatible by the Food and Drug Agency (FDA) of the United States, is an attractive alternative because firstly it is a polymer material, thereby reducing the chances of breakages inside the skin, and secondly it is a negative photoresist, thereby leading to ease of fabrication. Thus, here we present very tall (around 1600 µm) SU-8 polymer-based hollow microneedles fabricated by a simple and repeatable process, which are a very good candidate for transdermal drug delivery as well as blood extraction. The paper elaborates on the details that allow the fabrication of such extreme aspect ratios (>100).

Topography printing to locally control wettability.

Science.gov (United States)

Zheng, Zijian; Azzaroni, Omar; Zhou, Feng; Huck, Wilhelm T S

2006-06-21

This paper reports a new patterning method, which utilizes NaOH to facilitate the irreversible binding between the PDMS stamp and substrates and subsequent cohesive mechanical failure to transfer the PDMS patterns. Our method shows high substrate tolerance and can be used to "print" various PDMS geometries on a wide range of surfaces, including Si100, glass, gold, polymers, and patterned SU8 photoresist. Using this technique, we are able to locally change the wettability of substrate surfaces by printing well-defined PDMS architectures on the patterned SU8 photoresist. It is possible to generate differential wetting and dewetting properties in microchannels and in the PDMS printed area, respectively.

Investigation on the mechanism of nitrogen plasma modified PDMS bonding with SU-8

Energy Technology Data Exchange (ETDEWEB)

Yang, Chengxin; Yuan, Yong J., E-mail: yongyuan@swjtu.edu.cn

2016-02-28

Graphical abstract: - Highlights: • Different nitrogen plasma processes modified PDMS bonding with SU-8 had been studied. • The effect of nitrogen plasma modification would produce the best result and the recovery of PDMS hydrophobicity could be delayed. - Abstract: Polydimethylsiloxane (PDMS) and SU-8 are both widely used for microfluidic system. However, it is difficult to permanently seal SU-8 microfluidic channels using PDMS with conventional methods. Previous efforts of combining these two materials mainly employed oxygen plasma modified PDMS. The nitrogen plasma modification of PDMS bonding with SU-8 is rarely studied in recent years. In this work, the mechanism of nitrogen plasma modified PDMS bonding with SU-8 was investigated. The fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and contact angle of a water droplet were used to analyze the nitrogen plasma modified surface and the hydrophilic stability of PDMS samples. Pull-off tests were used for estimating the bonding effect of interface between nitrogen plasma modified PDMS and SU-8.

Improving plasma resistance and lowering roughness in an ArF photoresist by adding a chemical reaction inhibitor

International Nuclear Information System (INIS)

Jinnai, Butsurin; Uesugi, Takuji; Koyama, Koji; Samukawa, Seiji; Kato, Keisuke; Yasuda, Atsushi; Maeda, Shinichi; Momose, Hikaru

2010-01-01

Major challenges associated with 193 nm lithography using an ArF photoresist are low plasma resistance and roughness formation in the ArF photoresist during plasma processes. We have previously found decisive factors affecting the plasma resistance and roughness formation in an ArF photoresist: plasma resistance is determined by UV/VUV radiation, and roughness formation is dominated by chemical reactions. In this study, based on our findings on the interaction between plasma radiation species and ArF photoresist polymers, we proposed an ArF photoresist with a chemical reaction inhibitor, which can trap reactive species from the plasma, and characterized the performances of the resultant ArF photoresist through neutral beam experiments. Hindered amine light stabilizers, i.e. 4-hydroxy-2,2,6,6-tetramethyl-1-piperidinyloxy (HO-TEMPO), were used as the chemical reaction inhibitor. Etching rates of the ArF photoresist films were not dependent on the HO-TEMPO content in the irradiations without chemical reactions or under UV/VUV radiation. However, in the irradiation with chemical reactions, the etching rates of the ArF photoresist films decreased as the HO-TEMPO content increased. In addition, the surface roughness decreased with the increase in the additive amount of chemical reaction inhibitor. According to FTIR analysis, a chemical reaction inhibitor can inhibit the chemical reactions in ArF photoresist films through plasma radicals. These results indicate that a chemical reaction inhibitor is effective against chemical reactions, resulting in improved plasma resistance and less roughness in an ArF photoresist. These results also support our suggested mechanism of plasma resistance and roughness formation in an ArF photoresist.

Fluorine atom subsurface diffusion and reaction in photoresist

International Nuclear Information System (INIS)

Greer, Frank; Fraser, D.; Coburn, J.W.; Graves, David B.

2003-01-01

Kinetic studies of fluorine and deuterium atoms interacting with an OiR 897 10i i-line photoresist (PR) are reported. All experiments were conducted at room temperature. Films of this PR were coated on quartz-crystal microbalance (QCM) substrates and exposed to alternating fluxes of these atoms in a high vacuum apparatus. Mass changes of the PR were observed in situ and in real time during the atom beam exposures using the QCM. A molecular-beam sampled differentially pumped quadrupole mass spectrometer (QMS) was used to measure the species desorbing from the PR surface during the F and D atom exposures. During the D atom exposures, hydrogen abstraction and etching of the PR was observed, but no DF formation was detected. However, during the F atom exposures, the major species observed to desorb from the surface was DF, formed from fluorine abstraction of deuterium from the photoresist. No evidence of film etching or fluorine self-abstraction was observed. The film mass increased during F atom exposure, evidently due to the replacement of D by F in the film. The rate of DF formation and mass uptake were both characterized by the same kinetics: An initially rapid step declining exponentially with time (e -t/τ ), followed by a much slower step following inverse square root of time (t -1/2 ) kinetics. The initially rapid step was interpreted as surface abstraction of D by F to form DF, which desorbs, with subsequent F impacting the surface inserted into surface C dangling bonds. The slower step was interpreted as F atoms diffusing into the fluorinated photoresist, forming DF at the boundary of the fluorinated carbon layer. The t -1/2 kinetics of this step are interpreted to indicate that F diffusion through the fluorinated carbon layer is much slower than the rate of F abstraction of D to form DF, or the rate of F insertion into the carbon dangling bonds left behind after DF formation. A diffusion-limited growth model was formulated, and the model parameters are

Effect of heat treatment on the electrical resistance of photoresist as related to radioisotopic thermoelectric generator aging

International Nuclear Information System (INIS)

Johnson, R.T. Jr.

1979-03-01

Photoresist is used in electrical contact definition and processing in radioisotopic thermoelectric generators. Inadequate removal of material during processing could lead to electrical shorting when exposed to the high temperature use environment. This effect has been simulated through studies of the electrical resistance of thin layers of photoresist (Kodak Metal Etch Resist) on glass (Corning 7052) with tungsten electrodes. Results show that both the photoresist and the glass contribute to the resistance. The glass resistance decreases with increasing temperature and becomes significant at high temperatures. Annealing studies on the photoresist show that the resistance of the photoresist decreases by over five orders of magnitude upon annealing to 500 0 C, with a corresponding decrease in activation energy from 0.27 eV (350 0 C anneal) to 0.10 eV (500 0 C anneal). Time dependent decreases in resistance of the photoresist were also measured for up to 8 to 9 days during high temperature anneals. Some electrolytic transport of tungsten may occur through the photoresist at high temperatures. Results are compared with data on thermoelectric generators and show that photoresist could cause the electrical aging (voltage degradation) problem observed in some generators

Chemical metallization of KMPR photoresist polymer in aqueous solutions

Energy Technology Data Exchange (ETDEWEB)

Zeb, Gul [MiQro Innovation Collaborative Centre (C2MI), 45, boul. de l' Aéroport, Bromont, QC, J2L 1S8 (Canada); Mining & Materials Engineering, McGill University, 3610,University Street, Montreal, QC, H3A 0C5 (Canada); Duong, Xuan Truong [Department of Mechanical Engineering, Ecole polytechnique de Montréal, Montréal, QC, H3C 3T5 (Canada); Thai Nguyen University of Technology, 3-2 Street, Thai Nguyen City (Viet Nam); Vu, Ngoc Pi; Phan, Quang The; Nguyen, Duc Tuong; Ly, Viet Anh [Thai Nguyen University of Technology, 3-2 Street, Thai Nguyen City (Viet Nam); Salimy, Siamak [ePeer Review LLC, 145 Pine Haven Shores Rd, Suite 1000-X, Shelburne, VT 05482 (United States); Le, Xuan Tuan, E-mail: xuantuan.le@teledyne.com [MiQro Innovation Collaborative Centre (C2MI), 45, boul. de l' Aéroport, Bromont, QC, J2L 1S8 (Canada); Thai Nguyen University of Technology, 3-2 Street, Thai Nguyen City (Viet Nam)

2017-06-15

Highlights: • Electroless deposition of Ni-B film on KMPR photoresist polymer insulator with excellent adhesion has been achieved. • This metallization has been carried out in aqueous solutions at low temperature. • Polyamine palladium complexes grafts serve as seeds for the electroless plating on KMPR. • This electroless metallization process is simple, industrially feasible, chromium-free and environment-friendly. - Abstract: While conventional methods for preparing thin films of metals and metallic alloys on insulating substrates in the field of microelectromechanical systems (MEMS) include vapor deposition techniques, we demonstrate here that electroless deposition can be considered as an alternate efficient approach to metallize the surface of insulating substrates, such as KMPR epoxy photoresist polymer. In comparison with the physical and chemical vapor deposition methods, which are well-established for metallization of photoresist polymers, our electroless nickel plating requires only immersing the substrates into aqueous solutions in open air at low temperatures. Thin films of nickel alloy have been deposited electrolessly on KMPR surface, through a cost-effective and environmental chromium-free process, mediated through direct grafting of amine palladium complexes in aqueous medium. This covalent organic coating provides excellent adhesion between KMPR and the nickel film and allows better control of the palladium catalyst content. Covalent grafting and characterization of the deposited nickel film have been carried out by means of Fourier-transform infrared spectroscopy, scanning electron microscopy, energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy techniques.

Novel SU-8/Ionic Liquid Composite for Tribological Coatings and MEMS

Directory of Open Access Journals (Sweden)

Leili Batooli

2015-05-01

Full Text Available Tribology of SU-8 polymer is increasingly relevant due to bursting use of this material in a variety of applications. This study is directed towards introduction and investigation of a novel self-lubricating composite of an ionic liquid (IL in SU-8. The new material can be utilized for fabrication of lubricating polymer coating with tunable surface properties or SU8-made elements for microelectromechanical systems (MEMS with enhanced tribological performance. It is shown that addition of IL drastically alters water affinity of the composite while UV patternability remains unmodified. A lower coefficient of friction and wear has been obtained for two investigated compositions with 4 and 10 wt % ionic liquid.

On grand unified SU(8)sub(L) x SU(8)sub(R) model

International Nuclear Information System (INIS)

Pirogov, Yu.F.

1980-01-01

In the model of early chiral grand unification SU(8)sub(L)xSU(8)sub(R) with intermediate symmetry hierarchies the radiation corrections for sinsup(2)thetasub(W)(μ) and α(μ) are calculated and unification mass M 8 is found in the one loop approximation with Higgs fields contribution being neglected. It is shown that there exists a natural hierarchy, leading to the decrease of sinsup(2)thetasub(W)(Msub(W)) down to the value sinsup(2)thetasub(W)=1/5-1/4 and simultaneous decrease of M 8 down to M 8 =(10 6 -10 7 ) GeV as compared with the values when there is no hierarchy [ru

Improved anti-stiction coating of SU-8 molds

DEFF Research Database (Denmark)

Lange, Jacob Moresco; Clausen, Casper Hyttel; Svendsen, Winnie Edith

2010-01-01

of the epoxy groups by oxygen plasma or sulfuric acid improves the deposition of FDTS. The deposition of FDTS on acid-activated and untreated SU-8 gave an identical well performing anti-stiction coating, as opposed to oxygen plasma activated surface which resulted in a poor FDTS coverage. In this paper...

Carbonization of SU-8 Based Electrode for MEMS Supercapacitors

OpenAIRE

Liu, Yang

2014-01-01

Supercapacitors are more sustainable and environmentally friendly energy sources than traditional ones. To achieve the supercapacitors with both energy density and power density that mainly depend on the effective surface area of theelectrodes, SU-8 can be used for electrode material to fabricate 3D microstructures as the electrodes that increase the effective surface area significantly. The objective of this project is to fabricate the reliable electrodes of large surface area for supercapac...

In situ SU-8 silver nanocomposites

DEFF Research Database (Denmark)

Fischer, Søren Vang; Uthuppu, Basil; Jakobsen, Mogens Havsteen

2015-01-01

Nanocomposite materials containing metal nanoparticles are of considerable interest in photonics and optoelectronics applications. However, device fabrication of such materials always encounters the challenge of incorporation of preformed nanoparticles into photoresist materials. As a solution to...

Broken SU(8) symmetry and the new particles

International Nuclear Information System (INIS)

Kramer, G.; Schiller, D.H.

1976-05-01

We study the mass spectra and wave functions for vector and pseudoscalar mesons in broken SU(8) (SU(8) is contained in SU(4)F * SU(2)J), where F stands for flavour and J for usual spin. The connection with the standard mass breaking in SU(4)F is worked out. We find that even in the presence of strong SU(8) breaking the ideal mixing scheme for the vector mesons can be approximately retained. For the pseudoscalar mesons the mixing of the singlet with the 63-plet representation of SU(8) turns out to be essential and stongly nonideal. (orig.) [de

Chemical metallization of KMPR photoresist polymer in aqueous solutions

Science.gov (United States)

Zeb, Gul; Duong, Xuan Truong; Vu, Ngoc Pi; Phan, Quang The; Nguyen, Duc Tuong; Ly, Viet Anh; Salimy, Siamak; Le, Xuan Tuan

2017-06-01

While conventional methods for preparing thin films of metals and metallic alloys on insulating substrates in the field of microelectromechanical systems (MEMS) include vapor deposition techniques, we demonstrate here that electroless deposition can be considered as an alternate efficient approach to metallize the surface of insulating substrates, such as KMPR epoxy photoresist polymer. In comparison with the physical and chemical vapor deposition methods, which are well-established for metallization of photoresist polymers, our electroless nickel plating requires only immersing the substrates into aqueous solutions in open air at low temperatures. Thin films of nickel alloy have been deposited electrolessly on KMPR surface, through a cost-effective and environmental chromium-free process, mediated through direct grafting of amine palladium complexes in aqueous medium. This covalent organic coating provides excellent adhesion between KMPR and the nickel film and allows better control of the palladium catalyst content. Covalent grafting and characterization of the deposited nickel film have been carried out by means of Fourier-transform infrared spectroscopy, scanning electron microscopy, energy-dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy techniques.

Simulation and experimental validation of a SU-8 based PCR thermocycler chip with integrated heaters and temperature sensor

DEFF Research Database (Denmark)

El-Ali, Jamil; Perch-Nielsen, Ivan R.; Poulsen, Claus Riber

2004-01-01

We present a SU-8 based polymerase chain reaction (PCR) chip with integrated platinum thin film heaters and temperature sensor. The device is fabricated in SU-8 on a glass substrate. The use of SU-8 provides a simple microfabrication process for the PCR chamber, controllable surface properties......C/s, respectively, the performance of the chip is comparable with the best silicon micromachined PCR chips presented in the literature. The SU-8 chamber surface was found to be PCR compatible by amplification of yeast gene ribosomal protein S3 and Campylobacter gene cadF. The PCR compatibility of the chamber...

Processing of thin SU-8 films

International Nuclear Information System (INIS)

Keller, Stephan; Blagoi, Gabriela; Lillemose, Michael; Haefliger, Daniel; Boisen, Anja

2008-01-01

This paper summarizes the results of the process optimization for SU-8 films with thicknesses ≤5 µm. The influence of soft-bake conditions, exposure dose and post-exposure-bake parameters on residual film stress, structural stability and lithographic resolution was investigated. Conventionally, the SU-8 is soft-baked after spin coating to remove the solvent. After the exposure, a post-exposure bake at a high temperature T PEB ≥ 90 °C is required to cross-link the resist. However, for thin SU-8 films this often results in cracking or delamination due to residual film stress. The approach of the process optimization is to keep a considerable amount of the solvent in the SU-8 before exposure to facilitate photo-acid diffusion and to increase the mobility of the monomers. The experiments demonstrate that a replacement of the soft-bake by a short solvent evaporation time at ambient temperature allows cross-linking of the thin SU-8 films even at a low T PEB = 50 °C. Fourier-transform infrared spectroscopy is used to confirm the increased cross-linking density. The low thermal stress due to the reduced T PEB and the improved structural stability result in crack-free structures and solve the issue of delamination. The knowledge of the influence of different processing parameters on the responses allows the design of optimized processes for thin SU-8 films depending on the specific application

On grand unified SU(8)sub(L)xSU(8)sub(R) model

International Nuclear Information System (INIS)

Pirogov, Yu.F.

1980-01-01

A set of general prjnciples justifying the choice of the group SU(N)sub(L)xSU(N)sub(R) with N=8 as the grand unified symmetry group is considered. Accordjng to these principles the group SU(N)sub(L)xSU(N)sub(R) is one of the most natural unified groups. Namely this group is maximum symmetry group of kinetic term of the Lagrangian of one family, which conserves fermion number. A new principle has been introduced according to which one of the manifestations of extended conformal invariance at small distances is mirror doubling of set of fermions, which is necessary on the other hand for renormalizability of the given unified model

A novel and simple fabrication method of embedded SU-8 micro channels by direct UV lithography

International Nuclear Information System (INIS)

Fu, C; Hung, C; Huang, H

2006-01-01

In this paper, we presents a novel and simple method to fabricate embedded micro channels. The method based on different light absorption properties of the SU-8 thick photoresist under different incident UV wavelengths. The channel structures are defined by the ordinary I-line, while the cover layer is patterned by the deep UV. Because the deep UV is obtained directly on the same aligner with a set of filter mirrors, the embedded channel can be easily produced without other rare facilities. Besides, the relationship between the thickness of the top layer and the exposure dose of the deep UV has been measured by an ingeniously designed experiment. The specific thickness of the top layer of the embedded micro channel can then be secured by the specific deep-UV exposure dose. Further more, many meaningful mechanical structures have been realized by this method, the material property of the top layer are also measured

Improving wettability of photo-resistive film surface with plasma surface modification for coplanar copper pillar plating of IC substrates

Science.gov (United States)

Xiang, Jing; Wang, Chong; Chen, Yuanming; Wang, Shouxu; Hong, Yan; Zhang, Huaiwu; Gong, Lijun; He, Wei

2017-07-01

The wettability of the photo-resistive film (PF) surfaces undergoing different pretreatments including the O2sbnd CF4 low-pressure plasma (OCLP) and air plasma (AP), is investigated by water contact angle measurement instrument (WCAMI) before the bottom-up copper pillar plating. Chemical groups analysis performed by attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectra (XPS) shows that after the OCLP and wash treatment, the wettability of PF surface is attenuated, because embedded fluorine and decreased oxygen content both enhance hydrophobicity. Compared with OCLP treatment, the PF surface treatment by non-toxic air plasma displays features of Csbnd O, Osbnd Cdbnd O, Cdbnd O and sbnd NO2 by AIR-FTIR and XPS, and a promoted wettability by WCAM. Under the identical electroplating condition, the surface with a better wettability allows electrolyte to spontaneously soak all the places of vias, resulting in improved copper pillar uniformity. Statistical analysis of metallographic data shows that more coplanar and flat copper pillars are achieved with the PF treatment of air plasma. Such modified copper-pillar-plating technology meets the requirement of accurate impedance, the high density interconnection for IC substrates.

Liquid immersion thermal crosslinking of 3D polymer nanopatterns for direct carbonisation with high structural integrity

Science.gov (United States)

Kang, Da-Young; Kim, Cheolho; Park, Gyurim; Moon, Jun Hyuk

2015-12-01

The direct pyrolytic carbonisation of polymer patterns has attracted interest for its use in obtaining carbon materials. In the case of carbonisation of nanopatterned polymers, the polymer flow and subsequent pattern change may occur in order to relieve their high surface energies. Here, we demonstrated that liquid immersion thermal crosslinking of polymer nanopatterns effectively enhanced the thermal resistance and maintained the structure integrity during the heat treatment. We employed the liquid immersion thermal crosslinking for 3D porous SU8 photoresist nanopatterns and successfully converted them to carbon nanopatterns while maintaining their porous features. The thermal crosslinking reaction and carbonisation of SU8 nanopatterns were characterised. The micro-crystallinity of the SU8-derived carbon nanopatterns was also characterised. The liquid immersion heat treatment can be extended to the carbonisation of various polymer or photoresist nanopatterns and also provide a facile way to control the surface energy of polymer nanopatterns for various purposes, for example, to block copolymer or surfactant self-assemblies.

Single photoresist masking for local porous Si formation

International Nuclear Information System (INIS)

Hourdakis, E; Nassiopoulou, A G

2014-01-01

A simple process for local electrochemical porous Si formation on a Si wafer using a photoresist mask was developed. In this respect, the AZ9260 photoresist from MicroChemicals was used, which is easily removed by simple immersion in acetone after the electrochemical process. The photoresist layer thickness and its adhesion to the Si substrate were optimized for increased etch resistance to the anodization solution. Using the above process, mesoporous Si layers as thick as 50 μm were locally formed on the Si wafer through the photoresist mask. The developed process paves the way towards a simple industrial batch Si technology process for the fabrication of mixed Si wafers containing local porous Si areas. These wafers are very interesting for future system-on-chip (SoC) applications, including RF analog/digital and sensors/electronics SoCs. (technical note)

Fabrication of tunable diffraction grating by imprint lithography with photoresist mold

Science.gov (United States)

Yamada, Itsunari; Ikeda, Yusuke; Higuchi, Tetsuya

2018-05-01

We fabricated a deformable transmission silicone [poly(dimethylsiloxane)] grating using a two-beam interference method and imprint lithography and evaluated its optical characteristics during a compression process. The grating pattern with 0.43 μm depth and 1.0 μm pitch was created on a silicone surface by an imprinting process with a photoresist mold to realize a simple, low-cost fabrication process. The first-order diffraction transmittance of this grating reached 10.3% at 632.8 nm wavelength. We also measured the relationship between the grating period and compressive stress to the fabricated elements. The grating period changed from 1.0 μm to 0.84 μm by 16.6% compression of the fabricated element in one direction, perpendicular to the grooves, and the first-order diffraction transmittance was 8.6%.

SU-8 Based Piezoresistive Mechanical Sensor

DEFF Research Database (Denmark)

Thaysen, Jacob; Yalcinkaya, Arda Deniz; Vestergaard, R.K.

2002-01-01

We present the first SU-8 based piezoresistive mechanical sensor. Conventionally, silicon has been used as a piezoresistive material due to its high gauge factor and thereby high sensitivity to strain changes in a sensor. By using the fact that SU-8 is much softer than silicon and that a gold...

Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent

Science.gov (United States)

Pfeifer, K.B.; Hoyt, A.E.; Frye, G.C.

1998-08-18

The acoustic-wave sensor is disclosed. The acoustic-wave sensor is designed for ambient or vapor-phase monitoring of a photoresist-stripping agent such as N-methylpyrrolidinone (NMP), ethoxyethylpropionate (EEP) or the like. The acoustic-wave sensor comprises an acoustic-wave device such as a surface-acoustic-wave (SAW) device, a flexural-plate-wave (FPW) device, an acoustic-plate-mode (APM) device, or a thickness-shear-mode (TSM) device (also termed a quartz crystal microbalance or QCM) having a sensing region on a surface thereof. The sensing region includes a sensing film for sorbing a quantity of the photoresist-stripping agent, thereby altering or shifting a frequency of oscillation of an acoustic wave propagating through the sensing region for indicating an ambient concentration of the agent. According to preferred embodiments of the invention, the acoustic-wave device is a SAW device; and the sensing film comprises poly(vinylacetate), poly(N-vinylpyrrolidinone), or poly(vinylphenol). 3 figs.

Preparation of a novel ferrofluidic photoresist for two-photon photopolymerization technique

International Nuclear Information System (INIS)

Tian Ye; Lu Dongxiao; Jiang Haobo; Lin Xiaomei

2012-01-01

We present a novel route for the preparation of ferrofluidic photoresist compatible with two-photon photopolymerization (TPP). To get a homogeneous ferrofluidic photoresit, the compatibility of photoresist and magnetic materials has been improved. Monodispersed Fe 3 O 4 nanoparticles synthesized via thermal decomposition of iron precursor were stabilized by 6-(methacryloyloxy) hexanoic acid (a kind of acrylate-based monomer). A ferrofluidic photoresist was prepared by doping the modified Fe 3 O 4 nanoparticles in acrylate-based resin. In this way, the dispersibility of nanoparticles in photoresist was enhanced significantly. As a representative example, a precise magnetic micron-sized spring was created. In the test of the magnetic response, the sensitivity of magnetic microspring was improved remarkably due to the optimization of the ferrofluidic photoresist. When the intensity of external magnetic field reached a value of 1500 Gs, the deformation rate of the microspring would get to 2.25, indicating the compatibility of the ferrofluidic photoresist in microfabrication. - Highlights: ► A novel ferrofluid photoresist was developed for TPP fabrication. ► A micrometer-sized magnetic spring was successfully created. ► Performance of microsprings was highly improved due to the optimization of nanoparticles.

SU-8 Cantilevers for Bio/chemical Sensing; Fabrication, Characterisation and Development of Novel Read-out Methods

Directory of Open Access Journals (Sweden)

Anja Boisen

2008-03-01

Full Text Available Here, we present the activities within our research group over the last five yearswith cantilevers fabricated in the polymer SU-8. We believe that SU-8 is an interestingpolymer for fabrication of cantilevers for bio/chemical sensing due to its simple processingand low Young’s modulus. We show examples of different integrated read-out methodsand their characterisation. We also show that SU-8 cantilevers have a reduced sensitivity tochanges in the environmental temperature and pH of the buffer solution. Moreover, weshow that the SU-8 cantilever surface can be functionalised directly with receptormolecules for analyte detection, thereby avoiding gold-thiol chemistry.

Analytical techniques for mechanistic characterization of EUV photoresists

Science.gov (United States)

Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

2017-03-01

Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

A three-dimensional microstructuring technique exploiting the positive photoresist property

International Nuclear Information System (INIS)

Hirai, Yoshikazu; Sugano, Koji; Tsuchiya, Toshiyuki; Tabata, Osamu

2010-01-01

The present paper describes a three-dimensional (3D) thick-photoresist microstructuring technique that exploits the effect of exposure wavelength on dissolution rate distributions in a thick-film diazonaphthoquinone (DNQ) photoresist. In fabricating 3D microstructure with specific applications, it is important to control the spatial dissolution rate distribution in the photoresist layer, since the lithographic performance for 3D microstructuring is largely determined by the details of the dissolution property. To achieve this goal, the effect of exposure wavelength on dissolution rate distributions was applied for 3D microstructuring. The parametric experimental results demonstrated (1) the advantages of the fabrication technique for 3D microstructuring and (2) the necessity of a dedicated simulation approach based on the measured thick-photoresist property for further verification. Thus, a simple and practical photolithography simulation model that makes use of the Fresnel diffraction theory and an empirically characterized DNQ photoresist property was adopted. Simulations revealed good quantitative agreement between the photoresist development profiles of the standard photolithography and the moving-mask UV lithography process. The simulation and experimental results conclude that the g-line (λ = 436 nm) process can reduce the dimensional limitation or complexity of the photolithography process for the 3D microstructuring which leads to nanoscale microstructuring.

SU-8 etching in inductively coupled oxygen plasma

DEFF Research Database (Denmark)

Rasmussen, Kristian Hagsted; Keller, Stephan Sylvest; Jensen, Flemming

2013-01-01

Structuring or removal of the epoxy based, photo sensitive polymer SU-8 by inductively coupled plasma reactive ion etching (ICP-RIE) was investigated as a function of plasma chemistry, bias power, temperature, and pressure. In a pure oxygen plasma, surface accumulation of antimony from the photo......-initiator introduced severe roughness and reduced etch rate significantly. Addition of SF6 to the plasma chemistry reduced the antimony surface concentration with lower roughness and higher etch rate as an outcome. Furthermore the etch anisotropy could be tuned by controlling the bias power. Etch rates up to 800 nm...

Replication of optical microlens arrays using photoresist coated molds

DEFF Research Database (Denmark)

Chakrabarti, Maumita; Dam-Hansen, Carsten; Stubager, Jørgen

2016-01-01

A cost reduced method of producing injection molding tools is reported and demonstrated for the fabrication of optical microlens arrays. A standard computer-numerical-control (CNC) milling machine was used to make a rough mold in steel. Surface treatment of the steel mold by spray coating...... with photoresist is used to smooth the mold surface providing good optical quality. The tool and process are demonstrated for the fabrication of an ø50 mm beam homogenizer for a color mixing LED light engine. The acceptance angle of the microlens array is optimized, in order to maximize the optical efficiency from...

Temperature effects in Au piezoresistors integrated in SU-8 cantilever chips

DEFF Research Database (Denmark)

Johansson, Alicia; Hansen, Ole; Hales, Jan Harry

2006-01-01

We present a cantilever-based biosensor chip made for the detection of biochemical molecules. The device is fabricated entirely in the photosensitive polymer SU-8 except for integrated piezoresistors made of Au. The integrated piezoresistors are used to monitor the surface stress changes due to b...

Progress in deep-UV photoresists

Indian Academy of Sciences (India)

Unknown

This paper reviews the recent development and challenges of deep-UV photoresists and their ... small amount of acid, when exposed to light by photo- chemical ... anomalous insoluble skin and linewidth shift when the. PEB was delayed.

Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

KAUST Repository

Kryask, Marie

2013-01-01

Hybrid nanoparticle photoresists and their patterning using DUV, EUV, 193 nm lithography and e-beam lithography has been investigated and reported earlier. The nanoparticles have demonstrated very high EUV sensitivity and significant etch resistance compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass loss and dissolution studies support the current model. © 2013SPST.

An SU-8-based microprobe with a nanostructured surface enhances neuronal cell attachment and growth

Science.gov (United States)

Kim, Eunhee; Kim, Jin-Young; Choi, Hongsoo

2017-12-01

Microprobes are used to repair neuronal injury by recording electrical signals from neuronal cells around the surface of the device. Following implantation into the brain, the immune response results in formation of scar tissue around the microprobe. However, neurons must be in close proximity to the microprobe to enable signal recording. A common reason for failure of microprobes is impaired signal recording due to scar tissue, which is not related to the microprobe itself. Therefore, the device-cell interface must be improved to increase the number of neurons in contact with the surface. In this study, we developed nanostructured SU-8 microprobes to support neuronal growth. Nanostructures of 200 nm diameter and depth were applied to the surface of microprobes, and the attachment and neurite outgrowth of PC12 cells on the microprobes were evaluated. Neuronal attachment and neurite outgrowth on the nanostructured microprobes were significantly greater than those on non-nanostructured microprobes. The enhanced neuronal attachment and neurite outgrowth on the nanostructured microprobes occurred in the absence of an adhesive coating, such as poly- l-lysine, and so may be useful for implantable devices for long-term use. Therefore, nanostructured microprobes can be implanted without adhesive coating, which can cause problems in vivo over the long term.

Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

KAUST Repository

Kryask, Marie; Trikeriotis, Markos; Ouyang, Christine; Chakrabarty, Sovik; Giannelis, Emmanuel P.; Ober, Christopher K.

2013-01-01

compared to other standard photoresists. The current study aims at investigating and establishing the underlying mechanism for dual tone patterning of these nanoparticle photoresist systems. Infrared spectroscopy and UV absorbance studies supported by mass

Improved Adhesion of Gold Thin Films Evaporated on Polymer Resin: Applications for Sensing Surfaces and MEMS

Directory of Open Access Journals (Sweden)

Behrang Moazzez

2013-05-01

Full Text Available We present and analyze a method to improve the morphology and mechanical properties of gold thin films for use in optical sensors or other settings where good adhesion of gold to a substrate is of importance and where controlled topography/roughness is key. To improve the adhesion of thermally evaporated gold thin films, we introduce a gold deposition step on SU-8 photoresist prior to UV exposure but after the pre-bake step of SU-8 processing. Shrinkage and distribution of residual stresses, which occur during cross-linking of the SU-8 polymer layer in the post-exposure baking step, are responsible for the higher adhesion of the top gold film to the post-deposition cured SU-8 sublayer. The SU-8 underlayer can also be used to tune the resulting gold film morphology. Our promoter-free protocol is easily integrated with existing sensor microfabrication processes.

Photolithography of thick photoresist coating for electrically controlled liquid crystal photonic bandgap fibre devices

DEFF Research Database (Denmark)

Wei, Lei; Khomtchenko, Elena; Alkeskjold, Thomas Tanggaard

2009-01-01

Thick photoresist coating for electrode patterning in an anisotropically etched V-groove is investigated for electrically controlled liquid crystal photonic bandgap fibre devices. The photoresist step coverage at the convex corners is compared with and without soft baking after photoresist spin...

Drift study of SU8 cantilevers in liquid and gaseous environments.

Science.gov (United States)

Tenje, Maria; Keller, Stephan; Dohn, Søren; Davis, Zachary J; Boisen, Anja

2010-05-01

We present a study of the drift, in terms of cantilever deflections without probe/target interactions, of polymeric SU8 cantilevers. The drift is measured in PBS buffer (pH 7.4) and under vacuum (1mbar) conditions. We see that the cantilevers display a large drift in both environments. We believe this is because the polymer matrix absorbs liquid in one situation whereas it is being degassed in the other. An inhomogeneous expansion/contraction of the cantilever is seen because one surface of the cantilever may still have remains of the release layer from the fabrication. To further study the effect, we coat the cantilevers with a hydrophobic coating, perfluorodecyltrichlorosilane (FDTS). Fully encapsulating the SU8 cantilever greatly reduces the drift in liquid whereas a less significant change is seen in vacuum.

Drift study of SU8 cantilevers in liquid and gaseous environments

DEFF Research Database (Denmark)

Tenje, Maria; Keller, Stephan Sylvest; Dohn, Søren

2010-01-01

We present a study of the drift, in terms of cantilever deflections without probe/target interactions, of polymeric SU8 cantilevers. The drift is measured in PBS buffer (pH 7.4) and under vacuum (1 mbar) conditions. We see that the cantilevers display a large drift in both environments. We believe...... coat the cantilevers with a hydrophobic coating, perfluorodecyltrichlorosilane (FDTS). Fully encapsulating the SU8 cantilever greatly reduces the drift in liquid whereas a less significant change is seen in vacuum....... this is because the polymer matrix absorbs liquid in one situation whereas it is being degassed in the other. An inhomogeneous expansion/contraction of the cantilever is seen because one surface of the cantilever may still have remains of the release layer from the fabrication. To further study the effect, we...

Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

International Nuclear Information System (INIS)

Pargon, E.; Menguelti, K.; Martin, M.; Bazin, A.; Joubert, O.; Chaix-Pluchery, O.; Sourd, C.; Derrough, S.; Lill, T.

2009-01-01

In this article, we have performed detailed investigations of the 193 nm photoresist transformations after exposure to the so-called HBr and Ar plasma cure treatments using various characterization techniques (x-ray photoelectron spectroscopy, Fourier transformed infrared, Raman analyses, and ellipsometry). By using windows with different cutoff wavelengths patched on the photoresist film, the role of the plasma vacuum ultraviolet (VUV) light on the resist modifications is clearly outlined and distinguished from the role of radicals and ions from the plasma. The analyses reveal that both plasma cure treatments induce severe surface and bulk chemical modifications of the resist films. The synergistic effects of low energetic ion bombardment and VUV plasma light lead to surface graphitization or cross-linking (on the order of 10 nm), while the plasma VUV light (110-210 nm) is clearly identified as being responsible for ester and lactone group removal from the resist bulk. As the resist modification depth depends strongly on the wavelength penetration into the material, it is found that HBr plasma cure that emits near 160-170 nm can chemically modify the photoresist through its entire thickness (240 nm), while the impact of Ar plasmas emitting near 100 nm is more limited. In the case of HBr cure treatment, Raman and ellipsometry analyses reveal the formation of sp 2 carbon atoms in the resist bulk, certainly thanks to hydrogen diffusion through the resist film assisted by the VUV plasma light.

UV-LIGA: From Development to Commercialization

Directory of Open Access Journals (Sweden)

Grégoire Genolet

2014-07-01

Full Text Available A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung started with the use of epoxy-based EPON® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without the use of a very expensive synchrotron source needed to expose the photoresist layer in X-ray LIGA. SU-8 photoresist appeared to be well-suited for LIGA templates, but also as a permanent material. Based on UV-LIGA and SU-8, Mimotec SA has developed processes to manufacture mold inserts and metallic components for various market fields. From one to three-level parts, from Ni to other materials, from simple to complicated parts with integrated functionalities, UV-LIGA has established itself as a manufacturing technology of importance for prototyping, as well as for mass-fabrication. This paper reviews some of the developments that led to commercial success in this field.

Advanced metal lift-off process using electron-beam flood exposure of single-layer photoresist

Science.gov (United States)

Minter, Jason P.; Ross, Matthew F.; Livesay, William R.; Wong, Selmer S.; Narcy, Mark E.; Marlowe, Trey

1999-06-01

In the manufacture of many types of integrated circuit and thin film devices, it is desirable to use a lift-of process for the metallization step to avoid manufacturing problems encountered when creating metal interconnect structures using plasma etch. These problems include both metal adhesion and plasma etch difficulties. Key to the success of the lift-off process is the creation of a retrograde or undercut profile in the photoresists before the metal deposition step. Until now, lift-off processing has relied on costly multi-layer photoresists schemes, image reversal, and non-repeatable photoresist processes to obtain the desired lift-off profiles in patterned photoresist. This paper present a simple, repeatable process for creating robust, user-defined lift-off profiles in single layer photoresist using a non-thermal electron beam flood exposure. For this investigation, lift-off profiles created using electron beam flood exposure of many popular photoresists were evaluated. Results of lift-off profiles created in positive tone AZ7209 and ip3250 are presented here.

Characterization of Line Nanopatterns on Positive Photoresist Produced by Scanning Near-Field Optical Microscope

Directory of Open Access Journals (Sweden)

Sadegh Mehdi Aghaei

2015-01-01

Full Text Available Line nanopatterns are produced on the positive photoresist by scanning near-field optical microscope (SNOM. A laser diode with a wavelength of 450 nm and a power of 250 mW as the light source and an aluminum coated nanoprobe with a 70 nm aperture at the tip apex have been employed. A neutral density filter has been used to control the exposure power of the photoresist. It is found that the changes induced by light in the photoresist can be detected by in situ shear force microscopy (ShFM, before the development of the photoresist. Scanning electron microscope (SEM images of the developed photoresist have been used to optimize the scanning speed and the power required for exposure, in order to minimize the final line width. It is shown that nanometric lines with a minimum width of 33 nm can be achieved with a scanning speed of 75 µm/s and a laser power of 113 mW. It is also revealed that the overexposure of the photoresist by continuous wave laser generated heat can be prevented by means of proper photoresist selection. In addition, the effects of multiple exposures of nanopatterns on their width and depth are investigated.

Symmetry hierarchies and radiative corrections in the grand unified model SU(8)/sub L/ x SU(8)/sub R/

International Nuclear Information System (INIS)

Pirogov, Y.F.

1982-01-01

In the SU(8)/sub L/ x SU(8)/sub R/ model of precocious chiral unification, radiative corrections for the effective parameters sin 2 theta/sub W/(μ) and α(μ) are calculated in the one-loop approximation, neglecting contributions of the Higgs fields, and the unification mass M 8 is determined in the presence of a hierarchy of intermediate symmetries. It is shown that a natural hierarchy exists which leads to a decrease in sin 2 theta/sub W/(M/sub W/L) down to the value sin 2 theta/sub W/ = (1/5)--(1/4) together with a decrease in M 8 down to M 8 = 10 6 --10 7 GeV in comparison with the values in the absence of a hierarchy

A two-step sealing-and-reinforcement SU8 bonding paradigm for the fabrication of shallow microchannels

Science.gov (United States)

Mehboudi, Aryan; Yeom, Junghoon

2018-03-01

Adhesive bonding is a key technique to create microfluidic devices when two separate substrates are used to form microchannels. Among many adhesives explored in microchannel fabrication, SU8 has been widely used as an adhesive layer for sealing the microchannel sidewalls. The majority of the available SU8-based bonding methods, however, suffer from the difficulties associated with sealing of two important types of the microchannel architecture: (1) shallow microchannels with small patterns on a large area, and (2) microchannels with ultra-low aspect ratios (e.g. 6 mm in width and 2~μ m in height). In this paper, a new bonding paradigm based upon the low-temperature and low-pressure SU8 bonding, consisting of two steps of sealing using a thin-SU8-coated PET film and bonding reinforcement using a SU8-coated glass slide, is proposed to resolve the aforementioned difficulties. Since it does not need complicated instruments such as a wafer bonding machine and a lamination device, the developed bonding paradigm is convenient and economical. We successfully demonstrate the compatibility of the proposed bonding paradigm with the two microchannel fabrication approaches based on the glass wet etching and the SU8 photo-lithography, where small microchannels with the innermost surfaces fully made of SU8 are obtained. A theoretical model is employed to better investigate the flow characteristics and the structural behavior of the microchannel including the PET film deformation, strain and von Mises stress distributions, bonding strength, etc. Moreover, we demonstrate the fabrication of the multi-height deep-shallow microchannel sidewalls and their sealing using the SU8-coated PET film. Finally, as a proof-of-concept device, a microfluidic filter consisting of the double-height deep-shallow microchannel is fabricated for separation of 3 µm and 10 µm particles.

On symmetry hierarchy and radiative corrections in the grand unified model SU(8)sub(L)xSU(8)sub(R)

International Nuclear Information System (INIS)

Pirogov, Yu.F.

1982-01-01

In the model of precocious chiral unification SU(8)sub(L)xSU(8)sub(R) radiative corrections are calculated for the effective parameters sin 2 thetaw(μ) and α(μ) and the unification mass M 8 is determifed in presence of a hierarchy of intermediate symmetries. The one-loop approximation is used and contributions from the Higgs fields are neglected. It is shown that a natural hierarchy exists leading to a decrease of sinsup(2)thetasub(w)(Msub(wsub(L))) up to sinsup(2)thetasub(w)=1/5-1/4 together with a decrease of M 8 up to M 8 =10 6 -10 7 GeV, as compared with the magnitudes without the hierarchy [ru

SU-8 hollow cantilevers for AFM cell adhesion studies

Science.gov (United States)

Martinez, Vincent; Behr, Pascal; Drechsler, Ute; Polesel-Maris, Jérôme; Potthoff, Eva; Vörös, Janos; Zambelli, Tomaso

2016-05-01

A novel fabrication method was established to produce flexible, transparent, and robust tipless hollow atomic force microscopy (AFM) cantilevers made entirely from SU-8. Channels of 3 μm thickness and several millimeters length were integrated into 12 μm thick and 40 μm wide cantilevers. Connected to a pressure controller, the devices showed high sealing performance with no leakage up to 6 bars. Changing the cantilever lengths from 100 μm to 500 μm among the same wafer allowed the targeting of various spring constants ranging from 0.5 to 80 N m-1 within a single fabrication run. These hollow polymeric AFM cantilevers were operated in the optical beam deflection configuration. To demonstrate the performance of the device, single-cell force spectroscopy experiments were performed with a single probe detaching in a serial protocol more than 100 Saccharomyces cerevisiae yeast cells from plain glass and glass coated with polydopamine while measuring adhesion forces in the sub-nanoNewton range. SU-8 now offers a new alternative to conventional silicon-based hollow cantilevers with more flexibility in terms of complex geometric design and surface chemistry modification.

SU-8 hollow cantilevers for AFM cell adhesion studies

International Nuclear Information System (INIS)

Martinez, Vincent; Behr, Pascal; Vörös, Janos; Zambelli, Tomaso; Drechsler, Ute; Polesel-Maris, Jérôme; Potthoff, Eva

2016-01-01

A novel fabrication method was established to produce flexible, transparent, and robust tipless hollow atomic force microscopy (AFM) cantilevers made entirely from SU-8. Channels of 3 μm thickness and several millimeters length were integrated into 12 μm thick and 40 μm wide cantilevers. Connected to a pressure controller, the devices showed high sealing performance with no leakage up to 6 bars. Changing the cantilever lengths from 100 μm to 500 μm among the same wafer allowed the targeting of various spring constants ranging from 0.5 to 80 N m −1 within a single fabrication run. These hollow polymeric AFM cantilevers were operated in the optical beam deflection configuration. To demonstrate the performance of the device, single-cell force spectroscopy experiments were performed with a single probe detaching in a serial protocol more than 100 Saccharomyces cerevisiae yeast cells from plain glass and glass coated with polydopamine while measuring adhesion forces in the sub-nanoNewton range. SU-8 now offers a new alternative to conventional silicon-based hollow cantilevers with more flexibility in terms of complex geometric design and surface chemistry modification. (paper)

Novel SU-8 based vacuum wafer-level packaging for MEMS devices

DEFF Research Database (Denmark)

Murillo, Gonzalo; Davis, Zachary James; Keller, Stephan Urs

2010-01-01

This work presents a simple and low-cost SU-8 based wafer-level vacuum packaging method which is CMOS and MEMS compatible. Different approaches have been investigated by taking advantage of the properties of SU-8, such as chemical resistance, optical transparence, mechanical reliability and versa......This work presents a simple and low-cost SU-8 based wafer-level vacuum packaging method which is CMOS and MEMS compatible. Different approaches have been investigated by taking advantage of the properties of SU-8, such as chemical resistance, optical transparence, mechanical reliability...

'The surface management system' (SuMS) database: a surface-based database to aid cortical surface reconstruction, visualization and analysis

Science.gov (United States)

Dickson, J.; Drury, H.; Van Essen, D. C.

2001-01-01

Surface reconstructions of the cerebral cortex are increasingly widely used in the analysis and visualization of cortical structure, function and connectivity. From a neuroinformatics perspective, dealing with surface-related data poses a number of challenges. These include the multiplicity of configurations in which surfaces are routinely viewed (e.g. inflated maps, spheres and flat maps), plus the diversity of experimental data that can be represented on any given surface. To address these challenges, we have developed a surface management system (SuMS) that allows automated storage and retrieval of complex surface-related datasets. SuMS provides a systematic framework for the classification, storage and retrieval of many types of surface-related data and associated volume data. Within this classification framework, it serves as a version-control system capable of handling large numbers of surface and volume datasets. With built-in database management system support, SuMS provides rapid search and retrieval capabilities across all the datasets, while also incorporating multiple security levels to regulate access. SuMS is implemented in Java and can be accessed via a Web interface (WebSuMS) or using downloaded client software. Thus, SuMS is well positioned to act as a multiplatform, multi-user 'surface request broker' for the neuroscience community.

Depth profile analysis of polymerized fluorine compound on photo-resist film with angle-resolved XPS

International Nuclear Information System (INIS)

Iijima, Yoshitoki; Kubota, Toshio; Oinaka, Syuhei

2013-01-01

Angle-resolved XPS (ARXPS) is an observation technique which is very effective in chemical depth analysis method less than photoelectron detected depth. For the analysis of depth profile, several analysis methods have been proposed to calculate the depth profile using the ARXPS method. The present report is the measurements of depth profile of the fluorine in a fluorine-containing photo-resist film using the ARXPS method and the depth profile of concentration have been successfully determined using the ARCtick 1.0 software. It has been observed that thickness of the fluorocarbon enriched surface layer of the photo-resist was 2.7 nm, and so that the convert of the ARXPS data from the angle profile to the depth profile was proved to be useful analysis method for the ultrathin layer depth. (author)

Quantitative approach for optimizing e-beam condition of photoresist inspection and measurement

Science.gov (United States)

Lin, Chia-Jen; Teng, Chia-Hao; Cheng, Po-Chung; Sato, Yoshishige; Huang, Shang-Chieh; Chen, Chu-En; Maruyama, Kotaro; Yamazaki, Yuichiro

2018-03-01

Severe process margin in advanced technology node of semiconductor device is controlled by e-beam metrology system and e-beam inspection system with scanning electron microscopy (SEM) image. By using SEM, larger area image with higher image quality is required to collect massive amount of data for metrology and to detect defect in a large area for inspection. Although photoresist is the one of the critical process in semiconductor device manufacturing, observing photoresist pattern by SEM image is crucial and troublesome especially in the case of large image. The charging effect by e-beam irradiation on photoresist pattern causes deterioration of image quality, and it affect CD variation on metrology system and causes difficulties to continue defect inspection in a long time for a large area. In this study, we established a quantitative approach for optimizing e-beam condition with "Die to Database" algorithm of NGR3500 on photoresist pattern to minimize charging effect. And we enhanced the performance of measurement and inspection on photoresist pattern by using optimized e-beam condition. NGR3500 is the geometry verification system based on "Die to Database" algorithm which compares SEM image with design data [1]. By comparing SEM image and design data, key performance indicator (KPI) of SEM image such as "Sharpness", "S/N", "Gray level variation in FOV", "Image shift" can be retrieved. These KPIs were analyzed with different e-beam conditions which consist of "Landing Energy", "Probe Current", "Scanning Speed" and "Scanning Method", and the best e-beam condition could be achieved with maximum image quality, maximum scanning speed and minimum image shift. On this quantitative approach of optimizing e-beam condition, we could observe dependency of SEM condition on photoresist charging. By using optimized e-beam condition, measurement could be continued on photoresist pattern over 24 hours stably. KPIs of SEM image proved image quality during measurement and

SU-8 Photolithography as a Toolbox for Carbon MEMS

Directory of Open Access Journals (Sweden)

Rodrigo Martinez-Duarte

2014-09-01

Full Text Available The use of SU-8 as precursor for glass-like carbon, or glassy carbon, is presented here. SU-8 carbonizes when subject to high temperature under inert atmosphere. Although epoxy-based precursors can be patterned in a variety of ways, photolithography is chosen due to its resolution and reproducibility. Here, a number of improvements to traditional photolithography are introduced to increase the versatility of the process. The shrinkage of SU-8 during carbonization is then detailed as one of the guidelines necessary to design carbon patterns. A couple of applications—(1 carbon-electrode dielectrophoresis for bioparticle manipulation; and (2 the use of carbon structures as micro-molds are also presented.

SU-8 photoresist-derived electrospun carbon nanofibres as high ...

Indian Academy of Sciences (India)

2017-06-09

Jun 9, 2017 ... as high-capacity anode material for lithium ion battery. M KAKUNURI, S KAUSHIK, A SAINI and C S SHARMA. ∗. Creative and Advanced Research Based On Nanomaterials (CARBON) Laboratory, Department of Chemical Engineering,. Indian Institute of Technology, Hyderabad, Kandi 502285, India. ∗.

Pyrolyzed Photoresist Carbon Electrodes for Trace Electroanalysis of Nickel(II

Directory of Open Access Journals (Sweden)

Ligia Maria Moretto

2015-05-01

Full Text Available Novel pyrolyzed photoresist carbon electrodes for electroanalytical applications have been produced by photolithographic technology followed by pyrolysis of the photoresist. A study of the determination of Ni(II dimethylglyoximate (Ni-DMG through adsorptive cathodic stripping voltammetry at an in situ bismuth-modified pyrolyzed photoresist electrode (Bi-PPCE is reported. The experimental conditions for the deposition of a bismuth film on the PPCE were optimized. The Bi-PPCE allowed the analysis of trace concentrations of Ni(II, even in the presence of Co(II, which is the main interference in this analysis, with cathodic stripping square wave voltammograms characterized by well-separated stripping peaks. The calculated limits of detection (LOD were 20 ng∙L−1 for Ni(II alone and 500 ng∙L−1 in the presence of Co(II. The optimized method was finally applied to the analysis of certified spring water (NIST1640a.

Electrodeposition properties of modified cational epoxy resin-type photoresist

International Nuclear Information System (INIS)

Yong He; Yunlong Zhang; Feipeng Wu; Miaozhen Li; Erjian Wang

1999-01-01

Multi-component cationic epoxy and acrylic resin system for ED photoresist was used in this work, since they can provide better storage stability for ED emulsion and better physical and chemical properties of deposited film than one-component system. The cationic main resin (AE) was prepared from amine modified epoxy resins and then treated with acetic acid. The amination degree was controlled as required. The synthetic procedure of cationic main resins is described in scheme I. The ED photoresist (AME) is composed of cationic main resin (AE) and nonionic multifunctional acrylic crosslinkers (PETA), in combination with suitable photo-initiator. They can easily be dispersed in deionized water to form a stable ED emulsion. The exposed part of deposited film upon UV irradiation occurs crosslinking to produce an insoluble semi-penetrating network and the unexposed part remains good solubility in the acidic water solution. It is readily utilized for fabrication of fine micropattern. The electrodeposition are carried out on Cu plate at room temperature. To evaluate the electrodeposition properties of ED photoresist (AME), the different influences are examined

Investigation of the bond strength between the photo-sensitive polymer SU-8 and gold

DEFF Research Database (Denmark)

Nordström, Maria; Johansson, Alicia; Sánchez Noguerón, E.

2005-01-01

adhesion promotors between the SU-8 and Au; (ii) the influence of the processing sequence, keeping either Au or SU-8 as the bottom layer; (iii) the importance of the UV exposure dosage of the SU-8. For comparison, also the bond strength between SU-8 and other materials was measured. For SU-8 and Au without...

Development of untethered SU-8 polymer scratch drive microrobots

KAUST Repository

Valencia Garcia, Manuel; Atallah, Tarek Nabil; Castro, David; Conchouso Gonzalez, David; Al Dosari, Mishari Ibraheem; Hammad, Rafat; Al Rawashdeh, Ehab Jamal; Zaher, Amir Omar; Kosel, Jü rgen; Foulds, Ian G.

2011-01-01

This paper presents the design, simulation, fabrication and testing of novel, untethered SU-8 polymer microrobots based on scratch drive actuators (SDAs). The design consists of two 100×120×10μm linked SDAs, individually operated close to their resonant frequencies. The resonant frequency and deflection behavior of an individual SDA can be controlled by its shape, thickness, and stiffening design features. As a result, paired SDAs can be actuated individually or simultaneously by a multifrequency driving signal, allowing for two-dimensional displacement. The fabrication process uses SU-8 as structural material and PMGI as sacrificial material. The SU-8 provides a flexible material for the SDA's plates as well as the bushing. Finally, a Cr/Au layer is blanket deposited to provide electrical conductivity.

Polymer cantilever platform for dielectrophoretic assembly of carbon nanotubes

DEFF Research Database (Denmark)

Johansson, Alicia; Calleja, M.; Dimaki, Maria

2004-01-01

A polymer cantilever platform for dielectrophoretic assembly of carbon nanotubes has been designed and realized. Multi-walled carbon nanotubes from aqueous solution have been assembled between two metal electrodes that are separated by 2 mu m and embedded in the polymer cantilever. The entire chip......, except for the metallic electrodes and wiring, was fabricated in the photoresist SU-8. SU-8 allows for an inexpensive, flexible and fast fabrication method, and the cantilever platform provides a hydrophobic surface that should be well suited for nanotube assembly. The device can be integrated in a micro...

Development of untethered SU-8 polymer scratch drive microrobots

KAUST Repository

Valencia Garcia, Manuel

2011-01-01

This paper presents the design, simulation, fabrication and testing of novel, untethered SU-8 polymer microrobots based on scratch drive actuators (SDAs). The design consists of two 100×120×10μm linked SDAs, individually operated close to their resonant frequencies. The resonant frequency and deflection behavior of an individual SDA can be controlled by its shape, thickness, and stiffening design features. As a result, paired SDAs can be actuated individually or simultaneously by a multifrequency driving signal, allowing for two-dimensional displacement. The fabrication process uses SU-8 as structural material and PMGI as sacrificial material. The SU-8 provides a flexible material for the SDA\\'s plates as well as the bushing. Finally, a Cr/Au layer is blanket deposited to provide electrical conductivity.

Metal Oxide Nanoparticle Photoresists for EUV Patterning

KAUST Repository

Jiang, Jing; Chakrabarty, Souvik; Yu, Mufei; Ober, Christopher K.

2014-01-01

© 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have

Dense vertical SU-8 microneedles drawn from a heated mold with precisely controlled volume

International Nuclear Information System (INIS)

Xiang, Zhuolin; Wang, Hao; Yen, Shih-Cheng; Lee, Chengkuo; Murugappan, Suresh Kanna; Pastorin, Giorgia

2015-01-01

Drawing lithography technology has recently become a popular technique to fabricate (3D) microneedles. The conventional drawing process shows some limitations in fabricating dense, scale-up and small microneedles. In this study, we demonstrate a new drawing lithography process from a self-loading mold which is able to overcome these challenges. Different from the conventional molds which have difficult alignment and loading issues, a released SU-8 membrane is attached onto a SU-8 coated wafer to generate an innovative self-loading mold. The physically distinct SU-8 colloid in this mold successfully avoids the merging of the microneedle tips in the drawing process. Meanwhile, the same SU-8 colloid in mold can provide microneedles with uniform lengths on a large surface area. Furthermore, a low temperature drawing process with this improved technique prevents sharp tips from bending during the solidification stage. Remarkably, this new drawing lithography technology can fabricate microneedles with various lengths and they are strong enough to penetrate the outermost skin layer, namely the stratum corneum. The spacing between two adjacent microneedles is optimized to maximize the penetration rate through the skin. Histology images and drug diffusion testing demonstrate that microchannels are successfully created and the drugs can permeate the tissue under the skin. The fabricated microneedles are demonstrated to deliver insulin in vivo and lower blood glucose levels, suggesting future possible applications for minimally invasive transdermal delivery of macromolecules. (paper)

Investigation of the bond strength between the photo-sensitive polymer SU-8 and Au

DEFF Research Database (Denmark)

Nordstrom, Maria; Johansson, Alicia; Sanches-Noguerón, E.

2004-01-01

promotors between the SU-8 and Au (ii) the effect of the processing sequence, either keeping SU-8 as bottum layer or Au (iii) varying the UV exposure dosage of the SU-8. For comparison, also the bond strength between SU-8 and other materials was measured. We report on bond strength of 4.8 +/- 1.2 MPa...

Development of an SU-8 MEMS process with two metal electrodes using amorphous silicon as a sacrificial material

KAUST Repository

Ramadan, Khaled S.

2013-02-08

This work presents an SU-8 surface micromachining process using amorphous silicon as a sacrificial material, which also incorporates two metal layers for electrical excitation. SU-8 is a photo-patternable polymer that is used as a structural layer for MEMS and microfluidic applications due to its mechanical properties, biocompatibility and low cost. Amorphous silicon is used as a sacrificial layer in MEMS applications because it can be deposited in large thicknesses, and can be released in a dry method using XeF2, which alleviates release-based stiction problems related to MEMS applications. In this work, an SU-8 MEMS process was developed using ;-Si as a sacrificial layer. Two conductive metal electrodes were integrated in this process to allow out-of-plane electrostatic actuation for applications like MEMS switches and variable capacitors. In order to facilitate more flexibility for MEMS designers, the process can fabricate dimples that can be conductive or nonconductive. Additionally, this SU-8 process can fabricate SU-8 MEMS structures of a single layer of two different thicknesses. Process parameters were optimized for two sets of thicknesses: thin (5-10 m) and thick (130 m). The process was tested fabricating MEMS switches, capacitors and thermal actuators. © 2013 IOP Publishing Ltd.

Giant negative photoresistance of ZnO single crystals

Energy Technology Data Exchange (ETDEWEB)

Barzola-Quiquia, Jose; Esquinazi, Pablo [Division of Superconductivity and Magnetism, University of Leipzig (Germany); Heluani, Silvia [Laboratorio de Fisica del Solido, FCEyT, Universidad Nacional de Tucuman, 4000 S. M. de Tucuman (Argentina); Villafuerte, Manuel [Dept. de Fisica, FCEyT, Universidad Nacional de Tucuman (Argentina); CONICET, Tucuman (Argentina); Poeppl, Andreas [Division of Magnetic Resonance of Complex Quantum Solids, University of Leipzig, D-04103 Leipzig (Germany)

2011-07-01

ZnO is a wide band gap semiconductor exhibiting the largest charge-carrier mobility among oxides. ZnO is a material with potential applications for short-wavelength optoelectronic devices, as a blue light emitting diodes and in spintronics. In this contribution we have measured the temperature dependence (30 K < T < 300 K) of the electrical resistance of ZnO single crystals prepared by hydrothermal method in darkness and under the influence of light in the ultraviolet range. The resistance decreases several orders of magnitude at temperatures T < 200 K after illumination. Electron paramagnetic resonance studies under illumination reveal that the excitation of Li acceptor impurities is the origin for the giant negative photoresistance effect. Permanent photoresistance effect is also observed, which remains many hours after leaving the crystal in darkness.

Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

DEFF Research Database (Denmark)

Wei, Lei; Khomtchenko, Elena; Alkeskjold, Thomas Tanggaard

2009-01-01

Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.......Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss....

Dielectric properties of ligand-modified gold nanoparticle/SU-8 photopolymer based nanocomposites

Energy Technology Data Exchange (ETDEWEB)

Toor, Anju, E-mail: atoor@berkeley.edu [Department of Mechanical Engineering, University of California, Berkeley, CA 94720 (United States); So, Hongyun, E-mail: hyso@berkeley.edu [Department of Mechanical Engineering, University of California, Berkeley, CA 94720 (United States); Pisano, Albert P. [Department of Mechanical Engineering, University of California, Berkeley, CA 94720 (United States); Department of Mechanical and Aerospace Engineering, University of California, San Diego, CA 92093 (United States)

2017-08-31

Highlights: • Ligand-modified gold NP/SU-8 nanocomposites were synthesized and demonstrated. • Particle agglomeration and dispersion were characterized with different NPs concentration. • Nanocomposites showed higher average dielectric permittivity compared to SU-8 only. • Relatively lower dielectric loss (average 0.09 at 1 kHz) was achieved with 10 % w/w NPs. - Abstract: This article reports the enhanced dielectric properties of a photodefinable polymer nanocomposite material containing sub–10 nm coated metal nanoparticles (NPs). The surface morphology of the synthesized dodecanethiol-functionalized gold NPs was characterized using the transmission electron microscopy (TEM). We investigated the particle agglomeration and dispersion during the various stages of the nanocomposite synthesis using TEM. Physical properties such as dielectric permittivity and dielectric loss were measured experimentally. The dependence of the dielectric permittivity and loss tangent on the particle concentration, and frequency was studied. Nanocomposite films showed an approximately three times enhancement in average dielectric constant over the polymer base value and an average dielectric loss of 0.09 at 1 kHz, at a filler loading of 10% w/w.

PDMS as a sacrificial substrate for SU-8-based biomedical and microfluidic applications

International Nuclear Information System (INIS)

Patel, Jasbir N; Kaminska, Bozena; Gray, Bonnie L; Gates, Byron D

2008-01-01

We describe a new fabrication process utilizing polydimethylesiloxane (PDMS) as a sacrificial substrate layer for fabricating free-standing SU-8-based biomedical and microfluidic devices. The PDMS-on-glass substrate permits SU-8 photo patterning and layer-to-layer bonding. We have developed a novel PDMS-based process which allows the SU-8 structures to be easily peeled off from the substrate after complete fabrication. As an example, a fully enclosed microfluidic chip has been successfully fabricated utilizing the presented new process. The enclosed microfluidic chip uses adhesive bonding technology and the SU-8 layers from 10 µm to 450 µm thick for fully enclosed microchannels. SU-8 layers as large as the glass substrate are successfully fabricated and peeled off from the PDMS layer as single continuous sheets. The fabrication results are supported by optical microscopy and profilometry. The peel-off force for the 120 µm thick SU-8-based chips is measured using a voice coil actuator (VCA). As an additional benefit the release step leaves the input and the output of the microchannels accessible to the outside world facilitating interconnecting to the external devices

Fabrication of an eyeball-like spherical micro-lens array using extrusion for optical fiber coupling

International Nuclear Information System (INIS)

Shen, S C; Huang, J C; Pan, C T; Chao, C H; Liu, K H

2009-01-01

Batch fabrication of an eyeball-like spherical micro-lens array (ESMA) not only can reduce micro assembly cost, but also can replace conventional ball lenses or costly gradient refractive index without sacrificing performance. Compared to the conventional half-spherical micro-lenses, the ESMA is an eyeball-like spherical lens which can focus light in all directions, thus providing application flexibility for optical purposes. The current ESMA is made of photoresist SU-8 using the extrusion process instead of the traditional thermal reflow process. For the process of an ESMA, this research develops a new process at ambient temperature by spin-coating SU-8 on a surface of a silicon wafer which serves as an extrusion plate and extruding it through a nozzle to form an ESMA. This nozzle consists of a nozzle orifice and nozzle cavity. The nozzle orifice is defined and made of SU-8 photoresist using ultra-violet lithography, which exhibits good mechanical property. The fabrication process of a nozzle cavity employs bulk micromachining to fabricate the cavities. Next, viscous SU-8 spun on the extrusion plate is extruded through the nozzle orifice to form an ESMA. Based on the effect of surface tension, by varying the amount of SU-8 on the plate extruded through different nozzle orifices, various diameters of ESMA can be fabricated. In this paper, a 4 × 4 ESMA with a numerical aperture of about 0.38 and diameters ranging from 60 to 550 µm is fabricated. Optical measurements indicate a diameter variance within 3% and the maximum coupling efficiency is approximately 62% when the single mode fiber is placed at a distance of 10 µm from the ESMA. The research has proved that the extrusion fabrication process of an ESMA is capable of enhancing the coupling efficiency

SU-8 as a Material for Microfabricated Particle Physics Detectors

CERN Document Server

Maoddi, Pietro; Jiguet, Sebastien; Renaud, Philippe

2014-01-01

Several recent detector te chnologies developed for particle physics applications are based on microfabricated structures. Dete ctors built with this approach generally exhibit the overall best performance in te rms of spatial and time resolution. Many properties of the SU-8 photoepoxy make it suitable for the manufacturing of microstructured particle detectors. This arti cle aims to review some emerging detector technologies making use of SU-8 microstructu ring, namely micropatte rn gaseous detectors and microfluidic scintillation detectors. Th e general working principle and main process steps for the fabrication of each device are reported, with a focus on the advantages brought to the device functionality by the us e of SU-8. A novel process based on multiple bonding steps for the fabrication of thin multila yer microfluidic scin tillation detectors developed by the authors is presented. Finally, a brief overview of the applications for the discussed devices is given.

Free-floating magnetic microstructures by mask photolithography

Science.gov (United States)

Huong Au, Thi; Thien Trinh, Duc; Bich Do, Danh; Phu Nguyen, Dang; Cong Tong, Quang; Diep Lai, Ngoc

2018-03-01

This work explores the fabrication of free-floating magnetic structures on a photocurable nanocomposite consisting of superparamagnetic magnetite nanoparticles (Fe3O4) and a commercial SU-8 negative tone photoresist. The nanocomposite was synthesized by mixing magnetic nanoparticles with different kinds of SU-8 resin. We demonstrated that the dispersion of Fe3O4 nanoparticles in nanocomposite solution strongly depended on the particles concentration, the viscosity of SU-8 polymer, and the mixing time. The influence of these factors was demonstrated by examining the structures fabricated by mask photolithography technique. We obtained the best quality of structures at a low concentration, below 5 wt%, of Fe3O4 nanoparticles in SU-8 2005 photoresist for a mixing time of about 20 days. The manipulation of free-floating magnetic microstructures by an external magnetic field was also demonstrated showing promising applications of this magnetic nanocomposite.

Fabrication of thin SU-8 cantilevers: initial bending, release and time stability

DEFF Research Database (Denmark)

Keller, Stephan Urs; Haefliger, D.; Boisen, Anja

2010-01-01

SU-8 cantilevers with a thickness of 2 mu m were fabricated using a dry release method and two steps of SU-8 photolithography. The processing of the thin SU-8 film defining the cantilevers was experimentally optimized to achieve low initial bending due to residual stress gradients. In parallel......, the rotational deformation at the clamping point allowed a qualitative assessment of the device release from the fluorocarbon-coated substrate. The change of these parameters during several months of storage at ambient temperature was investigated in detail. The introduction of a long hard bake in an oven after...... development of the thin SU-8 film resulted in reduced cantilever bending due to removal of residual stress gradients. Further, improved time-stability of the devices was achieved due to the enhanced cross-linking of the polymer. A post-exposure bake at a temperature T-PEB = 50 degrees C followed by a hard...

Tribo-functionalizing Si and SU8 materials by surface modification for application in MEMS/NEMS actuator-based devices

International Nuclear Information System (INIS)

Singh, R A; Satyanarayana, N; Sinha, S K; Kustandi, T S

2011-01-01

Micro/nano-electro-mechanical-systems (MEMS/NEMS) are miniaturized devices built at micro/nanoscales. At these scales, the surface/interfacial forces are extremely strong and they adversely affect the smooth operation and the useful operating lifetimes of such devices. When these forces manifest in severe forms, they lead to material removal and thereby reduce the wear durability of the devices. In this paper, we present a simple, yet robust, two-step surface modification method to significantly enhance the tribological performance of MEMS/NEMS materials. The two-step method involves oxygen plasma treatment of polymeric films and the application of a nanolubricant, namely perfluoropolyether. We apply the two-step method to the two most important MEMS/NEMS structural materials, namely silicon and SU8 polymer. On applying surface modification to these materials, their initial coefficient of friction reduces by ∼4-7 times and the steady-state coefficient of friction reduces by ∼2.5-3.5 times. Simultaneously, the wear durability of both the materials increases by >1000 times. The two-step method is time effective as each of the steps takes the time duration of approximately 1 min. It is also cost effective as the oxygen plasma treatment is a part of the MEMS/NEMS fabrication process. The two-step method can be readily and easily integrated into MEMS/NEMS fabrication processes. It is anticipated that this method will work for any kind of structural material from which MEMS/NEMS are or can be made.

Tribo-functionalizing Si and SU8 materials by surface modification for application in MEMS/NEMS actuator-based devices

Science.gov (United States)

Singh, R. A.; Satyanarayana, N.; Kustandi, T. S.; Sinha, S. K.

2011-01-01

Micro/nano-electro-mechanical-systems (MEMS/NEMS) are miniaturized devices built at micro/nanoscales. At these scales, the surface/interfacial forces are extremely strong and they adversely affect the smooth operation and the useful operating lifetimes of such devices. When these forces manifest in severe forms, they lead to material removal and thereby reduce the wear durability of the devices. In this paper, we present a simple, yet robust, two-step surface modification method to significantly enhance the tribological performance of MEMS/NEMS materials. The two-step method involves oxygen plasma treatment of polymeric films and the application of a nanolubricant, namely perfluoropolyether. We apply the two-step method to the two most important MEMS/NEMS structural materials, namely silicon and SU8 polymer. On applying surface modification to these materials, their initial coefficient of friction reduces by ~4-7 times and the steady-state coefficient of friction reduces by ~2.5-3.5 times. Simultaneously, the wear durability of both the materials increases by >1000 times. The two-step method is time effective as each of the steps takes the time duration of approximately 1 min. It is also cost effective as the oxygen plasma treatment is a part of the MEMS/NEMS fabrication process. The two-step method can be readily and easily integrated into MEMS/NEMS fabrication processes. It is anticipated that this method will work for any kind of structural material from which MEMS/NEMS are or can be made.

Supercritical fluid processing: a new dry technique for photoresist developing

Science.gov (United States)

Gallagher-Wetmore, Paula M.; Wallraff, Gregory M.; Allen, Robert D.

1995-06-01

Supercritical fluid (SCF) technology is investigated as a dry technique for photoresist developing. Because of their unique combination of gaseous and liquid-like properties, these fluids offer comparative or improved efficiencies over liquid developers and, particularly carbon dioxide, would have tremendous beneficial impact on the environment and on worker safety. Additionally, SCF technology offers the potential for processing advanced resist systems which are currently under investigation as well as those that may have been abandoned due to problems associated with conventional developers. An investigation of various negative and positive photoresist systems is ongoing. Initially, supercritical carbon dioxide (SC CO2) as a developer for polysilane resists was explored because the exposure products, polysiloxanes, are generally soluble in this fluid. These initial studies demonstrated the viability of the SCF technique with both single layer and bilayer systems. Subsequently, the investigation focused on using SC CO2 to produce negative images with polymers that would typically be considered positive resists. Polymers such as styrenes and methacrylates were chemically modified by fluorination and/or copolymerization to render them soluble in SC CO2. Siloxane copolymers and siloxane-modified methacrylates were examined as well. The preliminary findings reported here indicate the feasibility of using SC CO2 for photoresist developing.

The conserved His8 of the Moloney murine leukemia virus Env SU subunit directs the activity of the SU-TM disulphide bond isomerase

International Nuclear Information System (INIS)

Li Kejun; Zhang, Shujing; Kronqvist, Malin; Ekstroem, Maria; Wallin, Michael; Garoff, Henrik

2007-01-01

Murine leukemia virus (MLV) fusion is controlled by isomerization of the disulphide bond between the receptor-binding surface (SU) and fusion-active transmembrane subunits of the Env-complex. The bond is in SU linked to a CXXC motif. This carries a free thiol that upon receptor binding can be activated (ionized) to attack the disulphide and rearrange it into a disulphide isomer within the motif. To find out whether His8 in the conserved SPHQ sequence of Env directs thiol activation, we analyzed its ionization in MLV vectors with wtEnv and Env with His8 deleted or substituted for Tyr or Arg, which partially or completely arrests fusion. The ionization was monitored by following the pH effect on isomerization in vitro by Ca 2+ depletion or in vivo by receptor binding. We found that wtEnv isomerized optimally at slightly basic pH whereas the partially active mutant required higher and the inactive mutants still higher pH. This suggests that His8 directs the ionization of the CXXC thiol

Plasma etching of polymers like SU8 and BCB

Science.gov (United States)

Mischke, Helge; Gruetzner, Gabi; Shaw, Mark

2003-01-01

Polymers with high viscosity, like SU8 and BCB, play a dominant role in MEMS application. Their behavior in a well defined etching plasma environment in a RIE mode was investigated. The 40.68 MHz driven bottom electrode generates higher etch rates combined with much lower bias voltages by a factor of ten or a higher efficiency of the plasma with lower damaging of the probe material. The goal was to obtain a well-defined process for the removal and structuring of SU8 and BCB using fluorine/oxygen chemistry, defined using variables like electron density and collision rate. The plasma parameters are measured and varied using a production proven technology called SEERS (Self Excited Electron Resonance Spectroscopy). Depending on application and on Polymer several metals are possible (e.g., gold, aluminum). The characteristic of SU8 and BCB was examined in the case of patterning by dry etching in a CF4/O2 chemistry. Etch profile and etch rate correlate surprisingly well with plasma parameters like electron density and electron collision rate, thus allowing to define to adjust etch structure in situ with the help of plasma parameters.

SU-8 micro Coriolis mass flow sensor

NARCIS (Netherlands)

Monge, Rosa; Groenesteijn, Jarno; Alveringh, Dennis; Wiegerink, Remco J.; Lötters, Joost Conrad; Fernandez, Luis J.

2017-01-01

Abstract This work presents the modelling, design, fabrication and test of the first micro Coriolis mass flow sensor fully fabricated in SU-8 by photolithography processes. The sensor consists of a channel with rectangular cross-section with inner opening of 100 μm × 100 μm and is actuated at

Epoxy based photoresist/carbon nanoparticle composites

DEFF Research Database (Denmark)

Lillemose, Michael; Gammelgaard, Lauge; Richter, Jacob

2008-01-01

We have fabricated composites of SU-8 polymer and three different types of carbon nanoparticles (NPs) using ultrasonic mixing. Structures of composite thin films have been patterned on a characterization chip with standard UV photolithography. Using a four-point bending probe, a well defined stress...... is applied to the composite thin film and we have demonstrated that the composites are piezoresistive. Stable gauge factors of 5-9 have been measured, but we have also observed piezoresistive responses with gauge factors as high as 50. As SU-8 is much softer than silicon and the gauge factor of the composite...

A proof of concept of a BioMEMS glucose biosensor using microfabricated SU-8 films

OpenAIRE

Psoma, Sotiria D.

2009-01-01

The present project investigated and proved the concept of developing a novel BioMEMS glucose micro-biosensor using a simple one-step microfabrication process of the widely used SU-8 polymer. More specifically, the study focused on the investigation of the suitability of the SU-8 polymer as a matrix for enzyme immobilisation that is carried out during the microfabrication process. A comparative study between commercially available SU-8 and “customised” SU-8 solutions showed tha...

Engineering and Characterizing Light-Matter Interactions in Photonic Crystals

Science.gov (United States)

2010-01-01

SU8 monomer has, on average, eight epoxy groups, that under go a ring-opening polymerization in the presence of an acid catalyst. SU8 falls into...copper oxide [49] into colloidal and SU8 polymer photonic crystal templates, respectively. 1.5.2 Gas-Phase Infilling Gas-phase deposition typically...resist using direct laser writing. 78 Figure 2. Scanning electron micrograph of an over- polymerized woodpile structure fabricated in SU8 photo-resist

Designing of high-resolution photoresists: use of modern NMR ...

Indian Academy of Sciences (India)

Unknown

Novolac copolymers were prepared by both one- and two- step procedures ... ture was diluted with hydrochloric acid (1 : 1) in an ice bath and the ..... spectrum of the negative photoresist. The almost super-. +. O. N2. SO2. O. O. DNQO. DNQO.

Loading of Drug-Polymer Matrices in Microreservoirs for Oral Drug Delivery

DEFF Research Database (Denmark)

Petersen, Ritika Singh; Keller, Stephan Sylvest; Boisen, Anja

2017-01-01

loading in microfabricated DDS. The microfabricated DDS are microcontainers fabricated in photoresist SU-8 and biopolymer poly-L-lactic-acid (PLLA). Furosemide (F) drug is embedded in poly-ε-caprolactone (PCL) polymer matrix. This F-PCL drug polymer matrix is loaded in SU-8 and PLLA microcontainers using...

Inkjet Printing of High Aspect Ratio Superparamagnetic SU-8 Microstructures with Preferential Magnetic Directions

Directory of Open Access Journals (Sweden)

Loïc Jacot-Descombes

2014-08-01

Full Text Available Structuring SU-8 based superparamagnetic polymer composite (SPMPC containing Fe3O4 nanoparticles by photolithography is limited in thickness due to light absorption by the nanoparticles. Hence, obtaining thicker structures requires alternative processing techniques. This paper presents a method based on inkjet printing and thermal curing for the fabrication of much thicker hemispherical microstructures of SPMPC. The microstructures are fabricated by inkjet printing the nanoparticle-doped SU-8 onto flat substrates functionalized to reduce the surface energy and thus the wetting. The thickness and the aspect ratio of the printed structures are further increased by printing the composite onto substrates with confinement pedestals. Fully crosslinked microstructures with a thickness up to 88.8 μm and edge angle of 112° ± 4° are obtained. Manipulation of the microstructures by an external field is enabled by creating lines of densely aggregated nanoparticles inside the composite. To this end, the printed microstructures are placed within an external magnetic field directly before crosslinking inducing the aggregation of dense Fe3O4 nanoparticle lines with in-plane and out-of-plane directions.

Process development for waveguide chemical sensors with integrated polymeric sensitive layers

Science.gov (United States)

Amberkar, Raghu; Gao, Zhan; Park, Jongwon; Henthorn, David B.; Kim, Chang-Soo

2008-02-01

Due to the proper optical property and flexibility in the process development, an epoxy-based, high-aspect ratio photoresist SU-8 is now attracting attention in optical sensing applications. Manipulation of the surface properties of SU-8 waveguides is critical to attach functional films such as chemically-sensitive layers. We describe a new integration process to immobilize fluorescence molecules on SU-8 waveguide surface for application to intensity-based optical chemical sensors. We use two polymers for this application. Spin-on, hydrophobic, photopatternable silicone is a convenient material to contain fluorophore molecules and to pattern a photolithographically defined thin layer on the surface of SU-8. We use fumed silica powders as an additive to uniformly disperse the fluorophores in the silicone precursor. In general, additional processes are not critically required to promote the adhesion between the SU-8 and silicone. The other material is polyethylene glycol diacrylate (PEGDA). Recently we demonstrated a novel photografting method to modify the surface of SU-8 using a surface bound initiator to control its wettability. The activated surface is then coated with a monomer precursor solution. Polymerization follows when the sample is exposed to UV irradiation, resulting in a grafted PEGDA layer incorporating fluorophores within the hydrogel matrix. Since this method is based the UV-based photografting reaction, it is possible to grow off photolithographically defined hydrogel patterns on the waveguide structures. The resulting films will be viable integrated components in optical bioanalytical sensors. This is a promising technique for integrated chemical sensors both for planar type waveguide and vertical type waveguide chemical sensors.

Invisible Security Printing on Photoresist Polymer Readable by Terahertz Spectroscopy

OpenAIRE

Hee Jun Shin; Min-Cheol Lim; Kisang Park; Sae-Hyung Kim; Sung-Wook Choi; Gyeongsik Ok

2017-01-01

We experimentally modulate the refractive index and the absorption coefficient of an SU-8 dry film in the terahertz region by UV light (362 nm) exposure with time dependency. Consequently, the refractive index of SU-8 film is increased by approximately 6% after UV light exposure. Moreover, the absorption coefficient also changes significantly. Using the reflective terahertz imaging technique, in addition, we can read security information printed by UV treatment on an SU-8 film that is transpa...

Single-mode waveguides with SU-8 polymer core and cladding for MOEMS applications

DEFF Research Database (Denmark)

Nordström, Maria; Zauner, Dan; Boisen, Anja

2007-01-01

Fabrication and optical characterization of singlemode polymeric embedded waveguides are performed. A specific material combination (SU-8 2005 as core and the modified SU-8 mr-L 6050XP as cladding) is chosen in order to obtain a small refractive index difference for single-mode propagation combined...... can fabricate waveguides with an index difference in the order of 10−3, where both the core material and the cladding material are based on SU-8. The refractive index measurements are performed on thin polymeric films, while further optical characterizations are performed on waveguides with a height...

Humidity influence on the adhesion of SU-8 polymer from MEMS applications

Directory of Open Access Journals (Sweden)

Birleanu Corina

2017-01-01

Full Text Available In this paper, the adhesion behaviors of SU-8 polymer thin film from MEMS application were investigated as a function of relative humidity. The adhesion test between the AFM tip and SU-8 polymer have been extensively studied using the atomic force microscope (AFM, for a relative humidity (RH varying between 20 and 90%. The samples for tests are SU-8 polymers hard baked at different temperatures. The hard bake temperature changes the tribo-mechanical properties of polymers. The paper reports the measurements and the modeling of adhesion forces versus humidity in controlled ranges between 20 to 90%RH. To investigate the effect of relative humidity on adhesion for SU-8 polymer hard baked we used an analytical method which encompasses the effect of capillarity as well as the solid-to-solid interaction. While the capillary force expression is considered to be the sum of the superficial tension and the Laplace force for the solid-solid interaction is expressed by the Derjagin, Muller and Toropov (DMT model of solids adhesion. The analytical results obtained are in accordance with those obtained experimentally.

SU-8-based microneedles for in vitro neural applications

International Nuclear Information System (INIS)

Altuna, Ane; Tijero, María; Berganzo, Javier; Salido, Rafa; Fernández, Luis J; Gabriel, Gemma; Guimerá, Anton; Villa, Rosa; Menéndez de la Prida, Liset

2010-01-01

This paper presents novel design, fabrication, packaging and the first in vitro neural activity recordings of SU-8-based microneedles. The polymer SU-8 was chosen because it provides excellent features for the fabrication of flexible and thin probes. A microprobe was designed in order to allow a clean insertion and to minimize the damage caused to neural tissue during in vitro applications. In addition, a tetrode is patterned at the tip of the needle to obtain fine-scale measurements of small neuronal populations within a radius of 100 µm. Impedance characterization of the electrodes has been carried out to demonstrate their viability for neural recording. Finally, probes are inserted into 400 µm thick hippocampal slices, and simultaneous action potentials with peak-to-peak amplitudes of 200–250 µV are detected.

Pyrolyzed Photoresist Electrodes for Integration in Microfluidic Chips for Transmitter Detection from Biological Cells

DEFF Research Database (Denmark)

Larsen, Simon Tylsgaard; Argyraki, Aikaterini; Amato, Letizia

2013-01-01

In this study, we show how pyrolyzed photoresist carbon electrodes can be used for amperometric detection of potassium-induced transmitter release from large groups of neuronal PC 12 cells. This opens the way for the use of carbon film electrodes in microfabricated devices for neurochemical drug ...... by the difference in photoresist viscosity. By adding a soft bake step to the fabrication procedure, the flatness of pyrolyzed AZ 5214 electrodes could be improved which would facilitate their integration in microfluidic chip devices....

Highlights of SPring-8 BL23SU in 2001

CERN Document Server

Agui, A; Nakatani, T; Yokoya, A; Yoshigoe, A

2002-01-01

BL23SU in SPring-8 is a soft x-ray beamline for the material science project in JAERI. The insertion device, monochromator and other beamline equipments have been installed or developed. The beamline maintenance has also been continued. We report highlights of these activities for the BL23SU in 2001. Specially, it has proceeded with the countermeasure against the rise in the maximum radiant power, toward the low-energy operation realization. And, improvement in that precision proceeds through the COD correlation to the ID drive as well.

Print-to-pattern dry film photoresist lithography

International Nuclear Information System (INIS)

Garland, Shaun P; Murphy, Terrence M Jr; Pan, Tingrui

2014-01-01

Here we present facile microfabrication processes, referred to as print-to-pattern dry film photoresist (DFP) lithography, that utilize the combined advantages of wax printing and DFP to produce micropatterned substrates with high resolution over a large surface area in a non-cleanroom setting. The print-to-pattern methods can be performed in an out-of-cleanroom environment making microfabrication much more accessible to minimally equipped laboratories. Two different approaches employing either wax photomasks or wax etchmasks from a solid ink desktop printer have been demonstrated that allow the DFP to be processed in a negative tone or positive tone fashion, respectively, with resolutions of 100 µm. The effect of wax melting on resolution and as a bonding material was also characterized. In addition, solid ink printers have the capacity to pattern large areas with high resolution, which was demonstrated by stacking DFP layers in a 50 mm × 50 mm woven pattern with 1 mm features. By using an office printer to generate the masking patterns, the mask designs can be easily altered in a graphic user interface to enable rapid prototyping. (technical note)

Spray-coatable negative photoresist for high topography MEMS applications

International Nuclear Information System (INIS)

Arnold, Markus; Haas, Sven; Schwenzer, Falk; Schwenzer, Gunther; Reuter, Danny; Geßner, Thomas; Voigt, Anja; Gruetzner, Gabi

2017-01-01

In microsystem technology, the lithographical processing of substrates with a topography is very important. Interconnecting lines, which are routed over sloped topography sidewalls from the top of the protecting wafer to the contact pads of the device wafer, are one example of patterning over a topography. For structuring such circuit paths, a photolithography process, and therefore a process for homogeneous photoresist coating, is required. The most flexible and advantageous way of depositing a homogeneous photoresist film over structures with high topography steps is spray-coating. As a pattern transfer process for circuit paths in cavities, the lift-off process is widely used. A negative resist, like ma-N (MRT) or AZnLOF (AZ) is favoured for lift-off processes due to the existing negative angle of the sidewalls. Only a few sprayable negative photoresists are commercially available. In this paper, the development of a novel negative resist spray-coating based on a commercially available single-layer lift-off resist for spin-coating, especially for the patterning of structures inside the cavity and on the cavity wall, is presented. A variety of parameters influences the spray-coating process, and therefore the patterning results. Besides the spray-coating tool and the parameters, the composition of the resist solution itself also influences the coating results. For homogeneous resist coverage over the topography of the substrate, different solvent combinations for diluting the resist solution, different chuck temperatures during the coating process, and also the softbake conditions, are all investigated. The solvent formulations and the process conditions are optimized with respect to the homogeneity of the resist coverage on the top edge of the cavities. Finally, the developed spray-coating process, the resist material and the process stability are demonstrated by the following applications: (i) lift-off, (ii) electroplating, (iii) the wet and (iv) the dry

Influences of pretreatment and hard baking on the mechanical reliability of SU-8 microstructures

International Nuclear Information System (INIS)

Morikaku, Toshiyuki; Kaibara, Yoshinori; Inoue, Shozo; Namazu, Takahiro; Inoue, Masatoshi; Miura, Takuya; Suzuki, Takaaki; Oohira, Fumikazu

2013-01-01

In this paper, the influences of pretreatment and hard baking on the mechanical characteristics of SU-8 microstructures are described. Four types of samples with different combinations of O 2 plasma ashing, primer coating and hard baking were prepared for shear strength tests and uniaxial tensile tests. Specially developed shear test equipment was used to experimentally measure the shear adhesion strength of SU-8 micro posts on a glass substrate. The adhesiveness was strengthened by hard baking at 200 °C for 60 min, whereas other pretreatment processes hardly affected the strength. The pretreatment and hard baking effects on the adhesive strength were compared with those on the fracture strength measured by uniaxial tensile testing. There were no influences of O 2 plasma ashing on both the strengths, and primer coating affected only tensile strength. The primer coating effect as well as the hard baking effect on stress relaxation phenomena in uniaxial tension was observed as well. Fourier transform infrared spectroscopy demonstrated that surface degradation and epoxide-ring opening polymerization would have given rise to the primer coating effect and the hard baking effect on the mechanical characteristics, respectively. (paper)

Influences of pretreatment and hard baking on the mechanical reliability of SU-8 microstructures

Science.gov (United States)

Morikaku, Toshiyuki; Kaibara, Yoshinori; Inoue, Masatoshi; Miura, Takuya; Suzuki, Takaaki; Oohira, Fumikazu; Inoue, Shozo; Namazu, Takahiro

2013-10-01

In this paper, the influences of pretreatment and hard baking on the mechanical characteristics of SU-8 microstructures are described. Four types of samples with different combinations of O2 plasma ashing, primer coating and hard baking were prepared for shear strength tests and uniaxial tensile tests. Specially developed shear test equipment was used to experimentally measure the shear adhesion strength of SU-8 micro posts on a glass substrate. The adhesiveness was strengthened by hard baking at 200 °C for 60 min, whereas other pretreatment processes hardly affected the strength. The pretreatment and hard baking effects on the adhesive strength were compared with those on the fracture strength measured by uniaxial tensile testing. There were no influences of O2 plasma ashing on both the strengths, and primer coating affected only tensile strength. The primer coating effect as well as the hard baking effect on stress relaxation phenomena in uniaxial tension was observed as well. Fourier transform infrared spectroscopy demonstrated that surface degradation and epoxide-ring opening polymerization would have given rise to the primer coating effect and the hard baking effect on the mechanical characteristics, respectively.

Combined electron beam and UV lithography in SU-8

DEFF Research Database (Denmark)

Gersborg-Hansen, Morten; Thamdrup, Lasse Højlund; Mironov, Andrej

2007-01-01

We present combined electron beam and UV lithography (CEUL) in SU-8 as a fast and flexible lithographic technique for prototyping of functional polymer devices and pattern transfer applications. CEUL is a lithographic technique suitable for defining both micrometer and nanometer scale features...

An isotropic suspension system for a biaxial accelerometer using electroplated thick metal with a HAR SU-8 mold

International Nuclear Information System (INIS)

Lee, Jin Seung; Lee, Seung S

2008-01-01

In this paper, a novel approach is developed to design an isotropic suspension system using thick metal freestanding micro-structures combining bulk micro-machining with electroplating based on a HAR SU-8 mold. An omega-shape isotropic suspension system composed of circular curved beams that have free switching of imaginary boundary conditions is proposed. This novel isotropic suspension design is not affected by geometric dimensional parameters and always achieves matching stiffness along the principle axes of elasticity. Using the finite element method, the isotropic suspension system was compared with an S-shaped meandering suspension system. In order to realize the suggested isotropic suspension system, a cost-effective fabrication process using electroplating with the SU-8 mold was developed to avoid expensive equipment and materials such as deep reactive-ion etching (DRIE) or a silicon-on-insulator (SOI) wafer. The fabricated isotropic suspension system was verified by electromagnetic actuation experiments. Finally, a biaxial accelerometer with isotropic suspension system was realized and tested using a vibration generator system. The proposed isotropic suspension system and the modified surface micro-machining technique based on electroplating with an SU-8 mold can contribute towards minimizing the system size, simplifying the system configuration, reducing the system price of and facilitating mass production of various types of low-cost sensors and actuators

Micro-particle filter made in SU-8 for biomedical applications

DEFF Research Database (Denmark)

Noeth, Nadine-Nicole; Keller, Stephan Urs; Fetz, Stefanie

2009-01-01

We have integrated a micro-particle filter in a polymer cantilever to filter micro-particles from a fluid while simultaneously measuring the amount of filtered particles. In a 3,8 mum thick SU-8 cantilever a filter was integrated with pore sizes between 3 and 30 mum. The chip was inserted in a mi...

Fabrication of thin SU-8 cantilevers: initial bending, release and time stability

International Nuclear Information System (INIS)

Keller, Stephan; Boisen, Anja; Haefliger, Daniel

2010-01-01

SU-8 cantilevers with a thickness of 2 µm were fabricated using a dry release method and two steps of SU-8 photolithography. The processing of the thin SU-8 film defining the cantilevers was experimentally optimized to achieve low initial bending due to residual stress gradients. In parallel, the rotational deformation at the clamping point allowed a qualitative assessment of the device release from the fluorocarbon-coated substrate. The change of these parameters during several months of storage at ambient temperature was investigated in detail. The introduction of a long hard bake in an oven after development of the thin SU-8 film resulted in reduced cantilever bending due to removal of residual stress gradients. Further, improved time-stability of the devices was achieved due to the enhanced cross-linking of the polymer. A post-exposure bake at a temperature T PEB = 50 °C followed by a hard bake at T HB = 90 °C proved to be optimal to ensure low cantilever bending and low rotational deformation due to excellent device release and low change of these properties with time. With the optimized process, the reproducible fabrication of arrays with 2 µm thick cantilevers with a length of 500 µm and an initial bending of less than 20 µm was possible. The theoretical spring constant of these cantilevers is k = 4.8 ± 2.5 mN m −1 , which is comparable to the value for Si cantilevers with identical dimensions and a thickness of 500 nm.

Polymer SU-8 Based Microprobes for Neural Recording and Drug Delivery

Science.gov (United States)

Altuna, Ane; Fernandez, Luis; Berganzo, Javier

2015-06-01

This manuscript makes a reflection about SU-8 based microprobes for neural activity recording and drug delivery. By taking advantage of improvements in microfabrication technologies and using polymer SU-8 as the only structural material, we developed several microprobe prototypes aimed to: a) minimize injury in neural tissue, b) obtain high-quality electrical signals and c) deliver drugs at a micrometer precision scale. Dedicated packaging tools have been developed in parallel to fulfill requirements concerning electric and fluidic connections, size and handling. After these advances have been experimentally proven in brain using in vivo preparation, the technological concepts developed during consecutive prototypes are discussed in depth now.

POLYMER SU-8 BASED MICROPROBES FOR NEURAL RECORDING AND DRUG DELIVERY

Directory of Open Access Journals (Sweden)

Ane eAltuna

2015-06-01

Full Text Available This manuscript makes a reflection about SU-8 based microprobes for neural activity recording and drug delivery. By taking advantage of improvements in microfabrication technologies and using polymer SU-8 as the only structural material, we developed several microprobe prototypes aimed to: a minimize injury in neural tissue, b obtain high-quality electrical signals and c deliver drugs at a micrometer precision scale. Dedicated packaging tools have been developed in parallel to fulfill requirements concerning electric and fluidic connections, size and handling. After these advances have been experimentally proven in brain using in vivo preparation, the technological concepts developed during consecutive prototypes are discussed in depth now.

The Morphology of Silver Layers on SU8 polymers prepared by Electroless Deposition

Science.gov (United States)

Dutta, Aniruddha; Yuan, Biao; Heinrich, Helge; Grabill, Chris; Williams, Henry; Kuebler, Stephen; Bhattacharya, Aniket

2010-03-01

Silver was deposited onto the functionalized surface of polymeric SU-8 where gold nanoparticles (Au-NPs) act as nucleation sites using electroless metallization chemistry. Here we report on the evolution of the nanoscale morphology of deposited Ag studied by Transmission Electron Microscopy (TEM). In TEM of sample cross sections correlations between the original gold and the silver nanoparticles were obtained while plan-view TEM results showed the distribution of nanoparticles on the surface. Scanning TEM with a high-angle annular dark field detector was used to obtain atomic number contrast. The morphology of the deposited Ag was controlled through the presence and absence of gum Arabic. The thickness and height fluctuations of the Ag layer were determined as a function of time and a statistical analysis of the growth process was conducted for the initial deposition periods.

Effects of vacuum ultraviolet photons, ion energy and substrate temperature on line width roughness and RMS surface roughness of patterned 193 nm photoresist

International Nuclear Information System (INIS)

Titus, M J; Graves, D B; Yamaguchi, Y; Hudson, E A

2011-01-01

We present a comparison of patterned 193 nm photoresist (PR) line width roughness (LWR) of samples processed in a well characterized argon (Ar) inductively coupled plasma (ICP) system to RMS surface roughness and bulk chemical modification of blanket 193 nm PR samples used as control samples. In the ICP system, patterned and blanket PR samples are irradiated with Ar vacuum ultraviolet photons (VUV) and Ar ions while sample temperature, photon flux, ion flux and ion energy are controlled and measured. The resulting chemical modifications to bulk 193 nm PR (blanket) and surface roughness are analysed with Fourier transform infrared spectroscopy and atomic force microscopy (AFM). LWR of patterned samples are measured with scanning electron microscopy and blanket portions of the patterned PRs are measured with AFM. We demonstrate that with no RF-bias applied to the substrate the LWR of 193 nm PR tends to smooth and correlates with the smoothing of the RMS surface roughness. However, both LWR and RMS surface roughness increases with simultaneous high-energy (≥70 eV) ion bombardment and VUV-irradiation and is a function of exposure time. Both high- and low-frequency LWR correlate well with the RMS surface roughness of the patterned and blanket 193 nm PR samples. LWR, however, does not increase with temperatures ranging from 20 to 80 deg. C, in contrast to the RMS surface roughness which increases monotonically with temperature. It is unclear why LWR remains independent of temperature over this range. However, the fact that blanket roughness and LWR on patterned samples, both scale similarly with VUV fluence and ion energy suggests a similar mechanism is responsible for both types of surface morphology modifications.

Effects of vacuum ultraviolet photons, ion energy and substrate temperature on line width roughness and RMS surface roughness of patterned 193 nm photoresist

Energy Technology Data Exchange (ETDEWEB)

Titus, M J; Graves, D B [Department of Chemical Engineering, University of California, Berkeley, CA 94720 (United States); Yamaguchi, Y; Hudson, E A, E-mail: graves@berkeley.edu [Lam Research Corporation, 4400 Cushing Parkway, Freemont, CA 94538 (United States)

2011-03-02

We present a comparison of patterned 193 nm photoresist (PR) line width roughness (LWR) of samples processed in a well characterized argon (Ar) inductively coupled plasma (ICP) system to RMS surface roughness and bulk chemical modification of blanket 193 nm PR samples used as control samples. In the ICP system, patterned and blanket PR samples are irradiated with Ar vacuum ultraviolet photons (VUV) and Ar ions while sample temperature, photon flux, ion flux and ion energy are controlled and measured. The resulting chemical modifications to bulk 193 nm PR (blanket) and surface roughness are analysed with Fourier transform infrared spectroscopy and atomic force microscopy (AFM). LWR of patterned samples are measured with scanning electron microscopy and blanket portions of the patterned PRs are measured with AFM. We demonstrate that with no RF-bias applied to the substrate the LWR of 193 nm PR tends to smooth and correlates with the smoothing of the RMS surface roughness. However, both LWR and RMS surface roughness increases with simultaneous high-energy ({>=}70 eV) ion bombardment and VUV-irradiation and is a function of exposure time. Both high- and low-frequency LWR correlate well with the RMS surface roughness of the patterned and blanket 193 nm PR samples. LWR, however, does not increase with temperatures ranging from 20 to 80 deg. C, in contrast to the RMS surface roughness which increases monotonically with temperature. It is unclear why LWR remains independent of temperature over this range. However, the fact that blanket roughness and LWR on patterned samples, both scale similarly with VUV fluence and ion energy suggests a similar mechanism is responsible for both types of surface morphology modifications.

Low Cost SU8 Based Above IC Process for High Q RF Power Inductors Integration

International Nuclear Information System (INIS)

Ghannam, A.; Bourrier, D.; Viallon, Ch.; Parra, Th.

2011-01-01

This paper presents a new process for integration of high-Q RF power inductors above low resistivity silicon substrates. The process uses the SU8 resin as a dielectric layer. The aim of using the SU8 is to form thick dielectric layer that can enhance the performance of the inductors. The flexibility of the process enables the possibility to realize complex shaped planar inductors with various dielectric and metal thicknesses to meet the requirements of the application. Q values of 55 at 5 GHz has been demonstrated for an inductance value of 0.8 nH using a 60 μm thick SU8 layer and 30 μm thick copper ribbons. (author)

SU-8 Cantilevers for Bio/chemical Sensing; Fabrication, Characterisation and Development of Novel Read-out Methods

OpenAIRE

Anja Boisen; Mogens Havsteen-Jakobsen; Gabriela Blagoi; Daniel Haefliger; Søren Dohn; Alicia Johansson; Michael Lillemose; Stephan Keller; Maria Nordström

2008-01-01

Here, we present the activities within our research group over the last five years with cantilevers fabricated in the polymer SU-8. We believe that SU-8 is an interesting polymer for fabrication of cantilevers for bio/chemical sensing due to its simple processing and low Young's modulus. We show examples of different integrated read-out methods and their characterisation. We also show that SU-8 cantilevers have a reduced sensitivity to changes in the environmental temperature and pH of the bu...

Single-mode waveguides with SU-8 polymer core and cladding for MOEMS applications

OpenAIRE

Nordström, Maria; Zauner, Dan; Boisen, Anja; Hübner, Jörg

2007-01-01

Fabrication and optical characterization of singlemode polymeric embedded waveguides are performed. A specific material combination (SU-8 2005 as core and the modified SU-8 mr-L 6050XP as cladding) is chosen in order to obtain a small refractive index difference for single-mode propagation combined with the conventional fabrication method UV lithography to facilitate the integration of different types of optical detection methods on lab-on-a-chip systems. We analyze the behavior of the refrac...

Hydrogenated amorphous silicon photoresists for HgCdTe patterning

Energy Technology Data Exchange (ETDEWEB)

Hollingsworth, R.E.; DeHart, C.; Wang, L.; Dinan, J.H.; Johnson, J.N.

1997-07-01

A process to use a hydrogenated amorphous silicon (a-Si:H) film as a dry photoresist mask for plasma etching of HgCdTe has been demonstrated. The a-Si:H films were deposited using standard plasma enhanced chemical vapor deposition with pure silane as the source gas. X-ray photoelectron spectra show that virtually no oxide grows on the surface of an a-Si:H film after 3 hours in air, indicating that it is hydrogen passivated. Ultraviolet light frees hydrogen from the surface and enhances the oxide growth rate. A pattern of 60 micron square pixels was transferred from a contact mask to the surface of an a-Si:H film by ultraviolet enhanced oxidation in air. For the conditions used, the oxide thickness was 0.5--1.0 nm. Hydrogen plasmas were used to develop this pattern by removing the unexposed regions of the film. A hydrogen plasma etch selectivity between oxide and a-Si:H of greater than 500:1 allows patterns as thick as 700 nm to be generated with this very thin oxide. These patterns were transferred into HgCdTe by etching in an electron cyclotron resonance plasma. An etch selectivity between a-Si:H and HgCdTe of greater than 4:1 was observed after etching 2,500 nm into the HgCdTe. All of the steps are compatible with processing in vacuum.

SU-8 Based MEMS Process with Two Metal Layers using α-Si as a Sacrificial Material

KAUST Repository

Ramadan, Khaled S.

2012-04-01

Polymer based microelectromechanical systems (MEMS) micromachining is finding more interest in research and applications. This is due to its low cost and less time processing compared with silicon MEMS. SU-8 is a photo-patternable polymer that is used as a structural layer for MEMS and microfluidic devices. In addition to being processed with low cost, it is a biocompatible material with good mechanical properties. Also, amorphous silicon (α-Si) has found use as a sacrificial layer in silicon MEMS applications. α-Si can be deposited at large thicknesses for MEMS applications and also can be released in a dry method using XeF2 which can solve stiction problems related to MEMS applications. In this thesis, an SU-8 MEMS process is developed using amorphous silicon (α-Si) as a sacrificial layer. Electrostatic actuation and sensing is used in many MEMS applications. SU-8 is a dielectric material which limits its direct use in electrostatic actuation. This thesis provides a MEMS process with two conductive metal electrodes that can be used for out-of-plane electrostatic applications like MEMS switches and variable capacitors. The process provides the fabrication of dimples that can be conductive or non-conductive to facilitate more flexibility for MEMS designers. This SU-8 process can fabricate SU-8 MEMS structures of a single layer of two different thicknesses. Process parameters were tuned for two sets of thicknesses which are thin (5-10μm) and thick (130μm). Chevron bent-beam structures and different suspended beams (cantilevers and bridges) were fabricated to characterize the SU-8 process through extracting the density, Young’s Modulus and the Coefficient of Thermal Expansion (CTE) of SU-8. Also, the process was tested and used as an educational tool through which different MEMS structures were fabricated including MEMS switches, variable capacitors and thermal actuators.

Fabrication of SU-8 low frequency electrostatic energy harvester

KAUST Repository

Ramadan, Khaled S.; Foulds, Ian G.

2011-01-01

A 1500μm × 1500μm × 150μm out-of-plane, gap closing, electrostatic energy harvester is designed and fabricated to harvest low-frequency ambient vibrations. SU-8 is used to fabricate the proof mass (1200μm × 1200μm × 150μm) and the 5 m springs

Mode-locked fiber laser using SU8 resist incorporating carbon nanotubes

Science.gov (United States)

Hernandez-Romano, Ivan; Mandridis, Dimitrios; May-Arrioja, Daniel A.; Sanchez-Mondragon, Jose J.; Delfyett, Peter J.

2011-06-01

We report the fabrication of a saturable absorber made of a novel polymer SU8 doped with Single Wall Carbon Nanotubes (SWCNTs). A passive mode-locked ring cavity fiber laser was built with a 100 μm thick SU8/SWCNT film inserted between two FC/APC connectors. Self-starting passively mode-locked lasing operation was observed at 1572.04 nm, with a FWHM of 3.26 nm. The autocorrelation trace was 1.536 ps corresponding to a pulse-width of 871 fs. The time-bandwidth product was 0.344, which is close enough to transform-limited sech squared pulses. The repetition rate was 21.27 MHz, and a maximum average output power of 1 mW was also measured.

Effect of thiol group on the curing process of alkaline developable photo-resists

International Nuclear Information System (INIS)

Hidetaka Oka; Masaki Ohwa; Hisatoshi Kura

1999-01-01

Photosensitivity of a conventional radical photo-initiator in an alkaline developable photoresist is boosted by substitution with a thiol group. Evidence is presented that the thiol group acts via chain transfer mechanism

SU(8) family unification with boson-fermion balance

CERN Multimedia

CERN. Geneva

2014-01-01

Grand unification has been intensively investigated for over forty years, and many different approaches have been tried. In this talk I propose a model that involves three ingredients that do not appear in the usual constructions: (1) boson--fermion balance without full supersymmetry, (2) canceling the spin 1/2 fermion gauge anomalies against the anomaly from a gauged spin 3/2 gravitino, and (3) using a scalar field representation with non-zero U(1) generator to break the SU(8) gauge symmetry through a ground state which, before dynamical symmetry breaking, has a periodic U(1) generator structure. The model has a number of promising features: (1) natural incorporation of three families, (2) incorporation of the experimentally viable flipped SU(5) model, (3) a symmetry breaking pathway to the standard model using the scalar field required by boson-fermion balance, together with a stage of most attractive channel dynamical symmetry breaking, without postulating additional Higgs fields, (4) vanishing of bare Yuk...

Graphitization in Carbon MEMS and Carbon NEMS

Science.gov (United States)

Sharma, Swati

Carbon MEMS (CMEMS) and Carbon NEMS (CNEMS) are an emerging class of miniaturized devices. Due to the numerous advantages such as scalable manufacturing processes, inexpensive and readily available precursor polymer materials, tunable surface properties and biocompatibility, carbon has become a preferred material for a wide variety of future sensing applications. Single suspended carbon nanowires (CNWs) integrated on CMEMS structures fabricated by electrospinning of SU8 photoresist on photolithographially patterned SU8 followed by pyrolysis are utilized for understanding the graphitization process in micro and nano carbon materials. These monolithic CNW-CMEMS structures enable the fabrication of very high aspect ratio CNWs of predefined length. The CNWs thus fabricated display core---shell structures having a graphitic shell with a glassy carbon core. The electrical conductivity of these CNWs is increased by about 100% compared to glassy carbon as a result of enhanced graphitization. We explore various tunable fabrication and pyrolysis parameters to improve graphitization in the resulting CNWs. We also suggest gas-sensing application of the thus fabricated single suspended CNW-CMEMS devices by using the CNW as a nano-hotplate for local chemical vapor deposition. In this thesis we also report on results from an optimization study of SU8 photoresist derived carbon electrodes. These electrodes were applied to the simultaneous detection of traces of Cd(II) and Pb(II) through anodic stripping voltammetry and detection limits as low as 0.7 and 0.8 microgL-1 were achieved. To further improve upon the electrochemical behavior of the carbon electrodes we elucidate a modified pyrolysis technique featuring an ultra-fast temperature ramp for obtaining bubbled porous carbon from lithographically patterned SU8. We conclude this dissertation by suggesting the possible future works on enhancing graphitization as well as on electrochemical applications

SuDS for managing surface water in Diepsloot informal settlement ...

African Journals Online (AJOL)

2017-04-02

Apr 2, 2017 ... ... of intervention. Keywords: SuDS, action research, water quality, informal settlements, Diepsloot ..... principles, solutions were explored that were a fusion of these ... was thought that the leachates from the landfill and surface.

Fabrication of high-aspect ratio SU-8 micropillar arrays

DEFF Research Database (Denmark)

Amato, Letizia; Keller, Stephan S.; Heiskanen, Arto

2012-01-01

to the resolution limit of photolithography. This paper describes process optimization for the fabrication of dense SU-8 micropillar arrays (2.5μm spacing) with nominal height ⩾20μm and nominal diameter ⩽2.5μm (AR ⩾8). Two approaches, differing in temperature, ramping rate and duration of the baking steps were...... compared as part of the photolithographic processing, in order to evaluate the effect of baking on the pattern resolution. Additionally, during the post-processing, supercritical point drying and hard baking were introduced yielding pillars with diameter 1.8μm, AR=11 and an improved temporal stability....

Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

KAUST Repository

Li, Li; Chakrabarty, Souvik; Spyrou, Konstantinos; Ober, Christopher K.; Giannelis, Emmanuel P.

2015-01-01

© 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists

Investigation of the AZ 5214E photoresist by the laser interference, EBDW and NSOM lithographies

Energy Technology Data Exchange (ETDEWEB)

Škriniarová, J., E-mail: jaroslava.skriniarova@stuba.sk [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia); Pudiš, D. [Department of Physics, University of Žilina, Žilina (Slovakia); Andok, R. [Department of E-Beam Lithography, Institute of Informatics, Slovak Academy of Sciences, Bratislava (Slovakia); Lettrichová, I. [Department of Physics, University of Žilina, Žilina (Slovakia); Uherek, F. [Institute of Electronics and Photonics, Slovak University of Technology, Bratislava (Slovakia)

2017-02-15

Highlights: • Applicability of the AZ 5214E photoresist for three different lithographies. • Useful for the fabrication of 1D and 2D periodic and irregular structures. • 2D structures with 260 nm period achieved by the laser interference lithography. • Structures with period below 500 nm achieved with the e-beam direct-write lithography. • Holes of 270 nm diameter made by the near-field scanning optical microscopy lithography. - Abstract: In this paper we show a comparison of chosen lithographies used for the AZ 5214E photoresist, which is normally UV sensitive but has also been investigated for its sensitivity to e-beam exposure. Three lithographies, the E-Beam Direct Write lithography (EBDW), laser Interference Lithography (IL) and the non-contact Near-field Scanning Optical Microscopy (NSOM) lithography, are discussed here and the results on exposed arrays of simple patterns are shown. With the EBDW and IL we achieved periods of the structures around half-micron, and we demonstrate attainability of dimensions smaller or comparable than usually achieved by a standard optical photolithography with the investigated photoresist. With the non-contact NSOM lithography structures with periods slightly above a micron were achieved.

PMMA to SU-8 Bonding for Polymer Based Lab-on-a-chip Systems with Integrated Optics

DEFF Research Database (Denmark)

Olsen, Brian Bilenberg; Nielsen, Theodor; Nilsson, Daniel

2003-01-01

An adhesive bonding technique for wafer-level sealing of SU-8 based lab-on-a-chip microsystems with integrated optical components is presented. Microfluidic channels and optical components, e.g. waveguides, are fabricated in cross-linked SU-8 and sealed with a Pyrex glass substrate by means...... strength of 16 MPa is achieved at bonding temperatures between 110 oC and 120oC, at a bonding force of 2000 N on a 4-inch wafer. The optical propagation loss of multi-mode 10ym (thickness)x 30ym (width)SU-8 waveguides is measured. The propagation loss in PMMA bonded waveguide struc-tures is more than 5 d......B/cm lower, at wavelengths between 600nm and 900 nm, than in similar structures bonded by an intermediate layer of SU-8. Furthermore 950K PMMA shows no tendency to flow into the bonded structures during bonding because of its high viscosity....

Degradation effects and Si-depth profiling in photoresists using ion beam analysis

NARCIS (Netherlands)

IJzendoorn, van L.J.; Schellekens, J.P.W.

1989-01-01

The reaction of silicon-containing vapour with a photoresist layer, as used in dry developable lithographic processes, was studied with Rutherford backscattering spectrometry (RBS). Degradation of the polymer layer was observed, but the total amount of incorporated Si was found to be constant during

Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography

Science.gov (United States)

Williams, Calum; Bartholomew, Richard; Rughoobur, Girish; Gordon, George S. D.; Flewitt, Andrew J.; Wilkinson, Timothy D.

2016-12-01

High-energy electron beam lithography for patterning nanostructures on insulating substrates can be challenging. For high resolution, conventional resists require large exposure doses and for reasonable throughput, using typical beam currents leads to charge dissipation problems. Here, we use UV1116 photoresist (Dow Chemical Company), designed for photolithographic technologies, with a relatively low area dose at a standard operating current (80 kV, 40-50 μC cm-2, 1 nAs-1) to pattern over large areas on commercially coated ITO-glass cover slips. The minimum linewidth fabricated was ˜33 nm with 80 nm spacing; for isolated structures, ˜45 nm structural width with 50 nm separation. Due to the low beam dose, and nA current, throughput is high. This work highlights the use of UV1116 photoresist as an alternative to conventional e-beam resists on insulating substrates. To evaluate suitability, we fabricate a range of transmissive optical devices, that could find application for customized wire-grid polarisers and spectral filters for imaging, which operate based on the excitation of surface plasmon polaritons in nanosized geometries, with arrays encompassing areas ˜0.25 cm2.

SU-8 as a material for lab-on-a-chip-based mass spectrometry.

Science.gov (United States)

Arscott, Steve

2014-10-07

This short review focuses on the application of SU-8 for the microchip-based approach to the miniaturization of mass spectrometry. Chip-based mass spectrometry will make the technology commonplace and bring benefits such as lower costs and autonomy. The chip-based miniaturization of mass spectrometry necessitates the use of new materials which are compatible with top-down fabrication involving both planar and non-planar processes. In this context, SU-8 is a very versatile epoxy-based, negative tone resist which is sensitive to ultraviolet radiation, X-rays and electron beam exposure. It has a very wide thickness range, from nanometres to millimetres, enabling the formation of mechanically rigid, very high aspect ratio, vertical, narrow width structures required to form microfluidic slots and channels for laboratory-on-a-chip design. It is also relatively chemically resistant and biologically compatible in terms of the liquid solutions used for mass spectrometry. This review looks at the impact and potential of SU-8 on the different parts of chip-based mass spectrometry - pre-treatment, ionization processes, and ion sorting and detection.

SU-8 based microdevices to study self-induced chemotaxis in 3D microenvironments

Science.gov (United States)

Ayuso, Jose; Monge, Rosa; Llamazares, Guillermo; Moreno, Marco; Agirregabiria, Maria; Berganzo, Javier; Doblaré, Manuel; Ochoa, Iñaki; Fernandez, Luis

2015-05-01

Tissues are complex three-dimensional structures in which cell behaviour is frequently guided by chemotactic signals. Although starvation and nutrient restriction induce many different chemotactic processes, the recreation of such conditions in vitro remains difficult when using standard cell culture equipment. Recently, microfluidic techniques have arisen as powerful tools to mimic such physiological conditions. In this context, microfluidic three-dimensional cell culture systems require precise control of cell/hydrogel location because samples need to be placed within a microchamber without obstruction of surrounding elements. In this article, SU-8 is studied as structural material for the fabrication of complex cell culture devices due to its good mechanical properties, low gas permeability and sensor integration capacity. In particular, this manuscript presents a SU-8 based microdevice designed to create “self-induced” medium starvation, based on the combination of nutrient restriction and natural cell metabolism. Results show a natural migratory response towards nutrient source, showing how cells adapt to their own microenvironment modifications. The presented results demonstrate the SU-8 potential for microdevice fabrication applied to cell culture.

SU-8 cantilevers for bio/chemical sensing; Fabrication, characterisation and development of novel read-out methods

DEFF Research Database (Denmark)

Nordström, M.; Keller, Stephan Urs; Lillemose, Michael

2008-01-01

Here, we present the activities within our research group over the last five years with cantilevers fabricated in the polymer SU-8. We believe that SU-8 is an interesting polymer for fabrication of cantilevers for bio/chemical sensing due to its simple processing and low Young's modulus. We show...

Stick-Jump (SJ) Evaporation of Strongly Pinned Nanoliter Volume Sessile Water Droplets on Quick Drying, Micropatterned Surfaces.

Science.gov (United States)

Debuisson, Damien; Merlen, Alain; Senez, Vincent; Arscott, Steve

2016-03-22

We present an experimental study of stick-jump (SJ) evaporation of strongly pinned nanoliter volume sessile water droplets drying on micropatterned surfaces. The evaporation is studied on surfaces composed of photolithographically micropatterned negative photoresist (SU-8). The micropatterning of the SU-8 enables circular, smooth, trough-like features to be formed which causes a very strong pinning of the three phase (liquid-vapor-solid) contact line of an evaporating droplet. This is ideal for studying SJ evaporation as it contains sequential constant contact radius (CCR) evaporation phases during droplet evaporation. The evaporation was studied in nonconfined conditions, and forced convection was not used. Micropatterned concentric circles were defined having an initial radius of 1000 μm decreasing by a spacing ranging from 500 to 50 μm. The droplet evaporates, successively pinning and depinning from circle to circle. For each pinning radius, the droplet contact angle and volume are observed to decrease quasi-linearly with time. The experimental average evaporation rates were found to decrease with decreasing pining radii. In contrast, the experimental average evaporation flux is found to increase with decreasing droplet radii. The data also demonstrate the influence of the initial contact angle on evaporation rate and flux. The data indicate that the total evaporation time of a droplet depends on the specific micropattern spacing and that the total evaporation time on micropatterned surfaces is always less than on flat, homogeneous surfaces. Although the surface patterning is observed to have little effect on the average droplet flux-indicating that the underlying evaporation physics is not significantly changed by the patterning-the total evaporation time is considerably modified by patterning, up to a factor or almost 2 compared to evaporation on a flat, homogeneous surface. The closely spaced concentric circle pinning maintains a large droplet radius and

Microring resonator based modulator made by direct photodefinition of an electro-optic polymer

NARCIS (Netherlands)

Lam, Nghi Q.; Balakrishnan, M.; Faccini, M.; Diemeer, Mart; Klein, E.J.; Sengo, G.; Sengo, G.; Driessen, A.; Verboom, Willem; Reinhoudt, David

2008-01-01

A laterally coupled microring resonator was fabricated by direct photodefinition of negative photoresist SU8, containing tricyanovinylidenediphenylaminobenzene chromophore, by exploiting the low ultraviolet absorption window of this chromophore. The ring resonator was first photodefined by slight

Fabrication of three-dimensional millimeter-height structures using direct ultraviolet lithography on liquid-state photoresist for simple and fast manufacturing

Science.gov (United States)

Kim, Jungkwun; Yoon, Yong-Kyu

2015-07-01

A rapid three-dimensional (3-D) ultraviolet (UV) lithography process for the fabrication of millimeter-tall high aspect ratio complex structures is presented. The liquid-state negative-tone photosensitive polyurethane, LF55GN, has been directly photopatterned using multidirectionally projected UV light for 3-D micropattern formation. The proposed lithographic scheme enabled us to overcome the maximum height obtained with a photopatternable epoxy, SU8, which has been conventionally most commonly used for the fabrication of tall and high aspect ratio microstructures. Also, the fabrication process time has been significantly reduced by eliminating photoresist-baking steps. Computer-controlled multidirectional UV lithography has been employed to fabricate 3-D structures, where the UV-exposure substrate is dynamically tilt-rotating during UV exposure to create various 3-D ray traces in the polyurethane layer. LF55GN has been characterized to provide feasible fabrication conditions for the multidirectional UV lithography. Very tall structures including a 6-mm tall triangular slab and a 5-mm tall hexablaze have been successfully fabricated. A 4.5-mm tall air-lifted polymer-core bowtie monopole antenna, which is the tallest monopole structure fabricated by photolithography and subsequent metallization, has been successfully demonstrated. The antenna shows a resonant radiation frequency of 12.34 GHz, a return loss of 36 dB, and a 10 dB bandwidth of 7%.

Electromagnetic characterization of strontium ferrite powders in series 2000, SU8 polymer

Science.gov (United States)

Sholiyi, Olusegun; Williams, John

2014-12-01

In this article, electromagnetic characterization of strontium hexaferrite powders and composites with SU8 was carried out to determine their compatibility with micro and millimeter wave fabrications. The structures of both powders and their composites were scanned with electron microscope to produce the SEM images. Two powder sizes (0.8-1.0 μm and 3-6 μm), were mixed with SU8, spin cast and patterned on wafer, and then characterized using energy dispersive x-ray spectrometry, ferromagnetic resonance (FMR) and vibrating sample magnetometry. In this investigation, FMRs of the samples were determined at 60 GHz while their complex permittivity and permeability were determined using rectangular waveguide method of characterization between 26.5 and 40 GHz frequency range. The results obtained show no adverse effects on the electromagnetic properties of the composites except some slight shift in the resonant frequencies due to anisotropic field of the samples.

Deep proton writing of high aspect ratio SU-8 micro-pillars on glass

Energy Technology Data Exchange (ETDEWEB)

Ebraert, Evert, E-mail: eebraert@b-phot.org; Rwamucyo, Ben; Thienpont, Hugo; Van Erps, Jürgen

2016-12-15

Deep proton writing (DPW) is a fabrication technology developed for the rapid prototyping of polymer micro-structures. We use SU-8, a negative resist, spincoated in a layer up to 720 μm-thick in a single step on borosilicate glass, for irradiation with a collimated 12 MeV energy proton beam. Micro-pillars with a slightly conical profile are irradiated in the SU-8 layer. We determine the optimal proton fluence to be 1.02 × 10{sup 4} μm{sup −2}, with which we are able to repeatably achieve micro-pillars with a top-diameter of 138 ± 1 μm and a bottom-diameter of 151 ± 3 μm. The smallest fabricated pillars have a top-diameter of 57 ± 5 μm. We achieved a root-mean-square sidewall surface roughness between 19 nm and 35 nm for the fabricated micro-pillars, measured over an area of 5 × 63.7 μm. We briefly discuss initial testing of two potential applications of the fabricated micro-pillars. Using ∼100 μm-diameter pillars as waveguides for gigascale integration optical interconnect applications, has shown a 4.7 dB improvement in optical multimode fiber-to-fiber coupling as compared to the case where an air–gap is present between the fibers at the telecom wavelength of 1550 nm. The ∼140 μm-diameter pillars were used for mold fabrication with silicone casting. The resulting mold can be used for hydrogel casting, to obtain hydrogel replicas mimicking human tissue for in vitro bio-chemical applications.

Co-fabrication of chitosan and epoxy photoresist to form microwell arrays with permeable hydrogel bottoms

Science.gov (United States)

Ornoff, Douglas M.; Wang, Yuli; Proctor, Angela; Shah, Akash S.; Allbritton, Nancy L.

2015-01-01

Microfabrication technology offers the potential to create biological platforms with customizable patterns and surface chemistries, allowing precise control over the biochemical microenvironment to which a cell or group of cells is exposed. However, most microfabricated platforms grow cells on impermeable surfaces. This report describes the co-fabrication of a micropatterned epoxy photoresist film with a chitosan film to create a freestanding array of permeable, hydrogel-bottomed microwells. These films possess optical properties ideal for microscopy applications, and the chitosan layers are semi-permeable with a molecular exclusion of 9.9 ± 2.1 kDa. By seeding cells into the microwells, overlaying inert mineral oil, and supplying media via the bottom surface, this hybrid film permits cells to be physically isolated from one another but maintained in culture for at least 4 days. Arrays co-fabricated using these materials reduce both large-molecular-weight biochemical crosstalk between cells and mixing of different clonal populations, and will enable high-throughput studies of cellular heterogeneity with increased ability to customize dynamic interrogations compared to materials in currently available technologies. PMID:26447557

Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

Science.gov (United States)

De Simone, Danilo; Mao, Ming; Kocsis, Michael; De Schepper, Peter; Lazzarino, Frederic; Vandenberghe, Geert; Stowers, Jason; Meyers, Stephen; Clark, Benjamin L.; Grenville, Andrew; Luong, Vinh; Yamashita, Fumiko; Parnell, Doni

2016-03-01

Inpria has developed a directly patternable metal oxide hard-mask as a robust, high-resolution photoresist for EUV lithography. In this paper we demonstrate the full integration of a baseline Inpria resist into an imec N7 BEOL block mask process module. We examine in detail both the lithography and etch patterning results. By leveraging the high differential etch resistance of metal oxide photoresists, we explore opportunities for process simplification and cost reduction. We review the imaging results from the imec N7 block mask patterns and its process windows as well as routes to maximize the process latitude, underlayer integration, etch transfer, cross sections, etch equipment integration from cross metal contamination standpoint and selective resist strip process. Finally, initial results from a higher sensitivity Inpria resist are also reported. A dose to size of 19 mJ/cm2 was achieved to print pillars as small as 21nm.

The gradient flow running coupling in SU2 with 8 flavors

DEFF Research Database (Denmark)

Rantaharju, Jarno; Karavirta, Tuomas; Leino, Viljami

2014-01-01

We present preliminary results of the gradient flow running coupling with Dirichlet boundary condition in the SU(2) gauge theory with 8 fermion flavours. Improvements to the gradient flow measurement allow us to obtain a robust continuum limit. The results are consistent with perturbative running...

Fabrication of SU-8 microstructures for analytical microfluidic applications

OpenAIRE

Tuomikoski, Santeri

2007-01-01

Miniaturization of analytical devices has been an ongoing trend to improve performance of analytical tools. These systems have been microfabricated originally of silicon and glass, but polymers have become increasingly popular as alternative materials. Polymers are mostly used because the material costs are lower and fabrication processes are easier. However, those facts depend heavily on the fabrication method and particular polymer. In this thesis the usability of epoxy-polymer SU-8 has bee...

Electromagnetic characterization of strontium ferrite powders in series 2000, SU8 polymer

International Nuclear Information System (INIS)

Sholiyi, Olusegun; Williams, John

2014-01-01

In this article, electromagnetic characterization of strontium hexaferrite powders and composites with SU8 was carried out to determine their compatibility with micro and millimeter wave fabrications. The structures of both powders and their composites were scanned with electron microscope to produce the SEM images. Two powder sizes (0.8–1.0 μm and 3–6 μm), were mixed with SU8, spin cast and patterned on wafer, and then characterized using energy dispersive x-ray spectrometry, ferromagnetic resonance (FMR) and vibrating sample magnetometry. In this investigation, FMRs of the samples were determined at 60 GHz while their complex permittivity and permeability were determined using rectangular waveguide method of characterization between 26.5 and 40 GHz frequency range. The results obtained show no adverse effects on the electromagnetic properties of the composites except some slight shift in the resonant frequencies due to anisotropic field of the samples. (paper)

Hybrid Quantum Cascade Lasers on Silicon-on-Sapphire

Science.gov (United States)

2016-11-23

platforms have undergone a tremendous expansion in recent years, driven initially by applications in fiber - optics communications and optical ...Figure 1. The epi-transfer procedure. (a) A fully-processed QCL on InP. (b) Supporting elements made of SU-8 photoresist epoxy are formed via optical ...removed via selective etching . (e) The QCL is bonded to a Si substrate with the SU-8 epoxy adhesive. (f) The glass slide and the Crystalbond glue is

Photodefinable electro-optic polymer for high-speed modulators

NARCIS (Netherlands)

Balakrishnan, M.; Faccini, M.; Diemeer, Mart; Verboom, Willem; Driessen, A.; Reinhoudt, David; Leinse, Arne

2006-01-01

Direct waveguide definition of a negative photoresist (SU8) containing tricyanovinylidenediphenylaminobenzene (TCVDPA) as electro-optic (EO) chromophore, has been demonstrated for the first time. This was possible by utilising the chromophore low absorption window in the UV region allowing

The SU(3)xU(1) invariant breaking of gauged N=8 supergravity

International Nuclear Information System (INIS)

Nicolai, H.; Warner, N.P.

1985-01-01

The SU(3) x U(1) invariant stationary point of N=8 supergravity is described in some detail. This vacuum has N=2 supersymmetry, and it is shown how the fields of N=8 supergravity may be collected into multiplets of SU(3) x Osp(2, 4). A new kind of shortened massive multiplet is described, and the multiplet shortening conditions for this and other multiplets are used to determine, by the use of group theory alone, the masses of many of the fields in the vacuum. The remaining masses are determined by explicit calculation. The critical point realizes Gell-Mann's scheme for relating the spin-1/2 fermions of the theory to the observed quarks and leptons. (orig.)

Distortion of 3D SU8 photonic structures fabricated by four-beam holographic lithography withumbrella configuration.

Science.gov (United States)

Zhu, Xuelian; Xu, Yongan; Yang, Shu

2007-12-10

We present a quantitative study of the distortion from a threeterm diamond-like structure fabricated in SU8 polymer by four-beam holographic lithography. In the study of the refraction effect, theory suggests that the lattice in SU8 should be elongated in the [111] direction but have no distortion in the (111) plane, and each triangular-like hole array in the (111) plane would rotate by ~30 degrees away from that in air. Our experiments agree with the prediction on the periodicity in the (111) plane and the rotation due to refraction effect, however, we find that the film shrinkage during lithographic process has nearly compensated the predicted elongation in the [111] direction. In study of photonic bandgap (PBG) properties of silicon photonic crystals templated by the SU8 structure, we find that the distortion has decreased quality of PBG.

Conformal coating by photoresist of sharp corners of anisotropically etched through-holes in silicon

DEFF Research Database (Denmark)

Heschel, Matthias; Bouwstra, Siebe

1997-01-01

The authors describe a photoresist treatment yielding conformal coating of three-dimensional silicon structures. This even includes the sharp corners of through-holes obtained by anisotropic etching in (100)-silicon. Resist reflow from these corners is avoided by replacing the common baking...

Organic Field-Effect Transistors Based on a Liquid-Crystalline Polymeric Semiconductor using SU-8 Gate Dielectrics onFlexible Substrates.

Science.gov (United States)

Tetzner, Kornelius; Bose, Indranil R; Bock, Karlheinz

2014-10-29

In this work, the insulating properties of poly(4-vinylphenol) (PVP) and SU-8 (MicroChem, Westborough, MA, USA) dielectrics are analyzed and compared with each other. We further investigate the performance behavior of organic field-effect transistors based on a semiconducting liquid-crystal polymer (LCP) using both dielectric materials and evaluate the results regarding the processability. Due to the lower process temperature needed for the SU-8 deposition, the realization of organic transistors on flexible substrates is demonstrated showing comparable charge carrier mobilities to devices using PVP on glass. In addition, a µ-dispensing procedure of the LCP on SU-8 is presented, improving the switching behavior of the organic transistors, and the promising stability data of the SU-8/LCP stack are verified after storing the structures for 60 days in ambient air showing negligible irreversible degradation of the organic semiconductor.

A High-Throughput SU-8Microfluidic Magnetic Bead Separator

DEFF Research Database (Denmark)

Bu, Minqiang; Christensen, T. B.; Smistrup, Kristian

2007-01-01

We present a novel microfluidic magnetic bead separator based on SU-8 fabrication technique for high through-put applications. The experimental results show that magnetic beads can be captured at an efficiency of 91 % and 54 % at flow rates of 1 mL/min and 4 mL/min, respectively. Integration...... of soft magnetic elements in the chip leads to a slightly higher capturing efficiency and a more uniform distribution of captured beads over the separation chamber than the system without soft magnetic elements....

Thermal and optical properties of sol-gel and SU-8 resists

Science.gov (United States)

Suzuki, Toshiyuki; Morikawa, Junko; Hashimoto, Toshimasa; Buividas, Ričardas; Gervinskas, Gediminas; Paipulas, Domas; Malinauskas, Mangirdas; Mizeikis, Vygantas; Juodkazis, Saulius

2012-03-01

We report on a combined differential scanning calorimetric (DSC) and Raman scattering study of thermal polymerization of sol-gel organic-inorganic SZ2080 and SU-8 resists. In SZ2080, endothermic peak at 95°C signify drying of the resist and justifies the required pre-bake at around 100°C for 1-2 h for the best performance during femtosecond (fs-)direct laser writing. A strong exothermic peak at 140°C (under 2 K/min heating rate) completes polymerization of the resist. It is revealed that 1wt% of photoinitiators change Raman scattering intensity of SZ2080 and can contribute efficiently to heating and cross-linking of photo-polymers. In the case of SU-8, a 65°C DSC feature related to solvent evaporation was observed. The strongest changes in Raman spectrum occurs at a narrow 895 cm-1 band which is linked to polymerization. Raman scattering taken during DSC revealed spectral changes following the polymerization; an applicability of this method for monitoring photopolymerization induced by ultra-fast laser sources and feasibility of a laser-modulated calorimetry is discussed.

NANOFILM - New metallic nanocomposites for micro and nanofabrication

DEFF Research Database (Denmark)

Fischer, Søren Vang

during the heat treatment or UV irradiation after spin coating. It was able possible to dissolve the gold precursor directly into the photoresist, but nanoparticles with large size distribution were formed within a time frame of 20 s. This made further processes such as spinning and formation...... or catalysts. The possibility to effectively structure the nanocomposites are however a limiting factor. In this project the UV sensitive photoresist SU-8 gold and silver nanocomposites have been fabricated which can be deposited and structured using standard micro and nanofabrication processes...

Organic Field-Effect Transistors Based on a Liquid-Crystalline Polymeric Semiconductor using SU-8 Gate Dielectrics onFlexible Substrates

Directory of Open Access Journals (Sweden)

Kornelius Tetzner

2014-10-01

Full Text Available In this work, the insulating properties of poly(4-vinylphenol (PVP and SU-8 (MicroChem, Westborough, MA, USA dielectrics are analyzed and compared with each other. We further investigate the performance behavior of organic field-effect transistors based on a semiconducting liquid-crystal polymer (LCP using both dielectric materials and evaluate the results regarding the processability. Due to the lower process temperature needed for the SU-8 deposition, the realization of organic transistors on flexible substrates is demonstrated showing comparable charge carrier mobilities to devices using PVP on glass. In addition, a µ-dispensing procedure of the LCP on SU-8 is presented, improving the switching behavior of the organic transistors, and the promising stability data of the SU-8/LCP stack are verified after storing the structures for 60 days in ambient air showing negligible irreversible degradation of the organic semiconductor.

Organic Field-Effect Transistors Based on a Liquid-Crystalline Polymeric Semiconductor using SU-8 Gate Dielectrics on Flexible Substrates

Science.gov (United States)

Tetzner, Kornelius; Bose, Indranil R.; Bock, Karlheinz

2014-01-01

In this work, the insulating properties of poly(4-vinylphenol) (PVP) and SU-8 (MicroChem, Westborough, MA, USA) dielectrics are analyzed and compared with each other. We further investigate the performance behavior of organic field-effect transistors based on a semiconducting liquid-crystal polymer (LCP) using both dielectric materials and evaluate the results regarding the processability. Due to the lower process temperature needed for the SU-8 deposition, the realization of organic transistors on flexible substrates is demonstrated showing comparable charge carrier mobilities to devices using PVP on glass. In addition, a µ-dispensing procedure of the LCP on SU-8 is presented, improving the switching behavior of the organic transistors, and the promising stability data of the SU-8/LCP stack are verified after storing the structures for 60 days in ambient air showing negligible irreversible degradation of the organic semiconductor. PMID:28788243

Biofriendly bonding processes for nanoporous implantable SU-8 microcapsules for encapsulated cell therapy.

Science.gov (United States)

Nemani, Krishnamurthy; Kwon, Joonbum; Trivedi, Krutarth; Hu, Walter; Lee, Jeong-Bong; Gimi, Barjor

2011-01-01

Mechanically robust, cell encapsulating microdevices fabricated using photolithographic methods can lead to more efficient immunoisolation in comparison to cell encapsulating hydrogels. There is a need to develop adhesive bonding methods which can seal such microdevices under physiologically friendly conditions. We report the bonding of SU-8 based substrates through (i) magnetic self assembly, (ii) using medical grade photocured adhesive and (iii) moisture and photochemical cured polymerization. Magnetic self-assembly, carried out in biofriendly aqueous buffers, provides weak bonding not suitable for long term applications. Moisture cured bonding of covalently modified SU-8 substrates, based on silanol condensation, resulted in weak and inconsistent bonding. Photocured bonding using a medical grade adhesive and of acrylate modified substrates provided stable bonding. Of the methods evaluated, photocured adhesion provided the strongest and most stable adhesion.

SP(6) X SU(2) and SO(8) X SU(2) - symmetric fermion-dynamic model of multinucleon systems

International Nuclear Information System (INIS)

Baktybaev, K.

2007-01-01

In last years a new approach describing collective states of multinucleon system on the base of their fermion dynamic symmetry was developed. Such fermion model is broad and logical one in comparison with the phenomenological model of interacting bosons. In cut fermion S- and D- pair spaces complicated nucleons interactions are approximating in that way so multinucleon system Hamiltonian becomes a simple function of fermion generators forming corresponding Lie algebra. Correlation fermion pairs are structured in such form so its operators of birth and destruction together with a set multiband operators are formed Sp(6) and SO(8) algebra of these pairs and SU(2)-algebra for so named anomalous pairs. For convenience at the model practical application to concrete systems the dynamical-symmetric Hamiltonian is writing by means of independent Casimir operators of subgroup are reductions of a large group. It is revealed, that observed Hamiltonians besides the known SU 3 , and SO 6 asymptotic borders have also more complicated 'vibration-like' borders SO 7 , SO 5 XSU 2 and SU 2 XSO 3 . In the paper both advantages and disadvantages of these borders and some its applications to specific nuclear systems are discussing

Low-noise polymeric nanomechanical biosensors

DEFF Research Database (Denmark)

Calleja, M.; Tamayo, J.; Nordström, Maria

2006-01-01

A sensor device based on a single polymer cantilever and optical readout has been developed for detection of molecular recognition reactions without the need of a reference cantilever for subtraction of unspecific signals. Microcantilevers have been fabricated in the photoresist SU-8 with one sur...

Supercritical CO2 drying of poly(methyl methacrylate) photoresist for deep x-ray lithography: a brief note

Science.gov (United States)

Shukla, Rahul; Abhinandan, Lala; Sharma, Shivdutt

2017-07-01

Poly(methyl methacrylate) (PMMA) is an extensively used positive photoresist for deep x-ray lithography. The post-development release of the microstructures of PMMA becomes very critical for high aspect ratio fragile and freestanding microstructures. Release of high aspect ratio comb-drive microstructure of PMMA made by one-step x-ray lithography (OXL) is studied. The effect of low-surface tension Isopropyl alcohol (IPA) over water is investigated for release of the high aspect ratio microstructures using conventional and supercritical (SC) CO2 drying. The results of conventional drying are also compared for the samples released or dried in both in-house developed and commercial SC CO2 dryer. It is found that in all cases the microstructures of PMMA are permanently deformed and damaged while using SC CO2 for drying. For free-standing high aspect ratio microstructures of PMMA made by OXL, it is advised to use low-surface tension IPA over DI water. However, this brings a limitation on the design of the microstructure.

Metal Oxide Nanoparticle Photoresists for EUV Patterning

KAUST Repository

Jiang, Jing

2014-01-01

© 2014SPST. Previous studies of methacrylate based nanoparticle have demonstrated the excellent pattern forming capability of these hybrid materials when used as photoresists under 13.5 nm EUV exposure. HfO2 and ZrO2 methacrylate resists have achieved high resolution (∼22 nm) at a very high EUV sensitivity (4.2 mJ/cm2). Further investigations into the patterning process suggests a ligand displacement mechanism, wherein, any combination of a metal oxide with the correct ligand could generate patterns in the presence of the suitable photoactive compound. The current investigation extends this study by developing new nanoparticle compositions with transdimethylacrylic acid and o-toluic acid ligands. This study describes their synthesis and patterning performance under 248 nm KrF laser (DUV) and also under 13.5 nm EUV exposures (dimethylacrylate nanoparticles) for the new resist compositions.

Gradient flow and IR fixed point in SU(2) with Nf=8 flavors

DEFF Research Database (Denmark)

Leino, Viljami; Karavirta, Tuomas; Rantaharju, Jarno

2015-01-01

We study the running of the coupling in SU(2) gauge theory with 8 massless fundamental representation fermion flavours, using the gradient flow method with the Schr\\"odinger functional boundary conditions. Gradient flow allows us to measure robust continuum limit for the step scaling function...

Development of 3D out-of-plane SU-8 microlenses using modified micromolding in capillaries (MIMIC) technology

Science.gov (United States)

Llobera, A.; Wilke, R.; Johnson, D. W.; Büttgenbach, S.

2006-04-01

This paper describes a modification of the standard MIMIC technology, solving its main drawbacks, to define arrays of spherical or ellipsoidal microlenses. Perfectly symmetrical meniscuses have been obtained by using a XP SU-8 NO-2 layer beneath the PDMS mold. Moreover, the photostructurable properties of this polymer allow obtaining self-alignment structures for adequate fiber optics positioning. Microchannels ended with these meniscuses have been filled with standard SU-8 to obtain 3D microlenses. Agreement between theory and experimental results allows confirming the validity of the proposed technology.

Silicon-depth profiling with Rutherford backscattering in photoresist layers; a study on the effects of degradation

NARCIS (Netherlands)

IJzendoorn, van L.J.; Schellekens, J.P.W.

1989-01-01

The reaction of a silicon-containing vapor with a photoresist layer, as used in some dry developable lithographic processes, was studied with Rutherford backscattering spectrometry. Degradation of the polymer layer under ion beam irradiation was observed, but it was found that this had no influence

Electromagnetic properties of photodefinable barium ferrite polymer composites

Science.gov (United States)

Sholiyi, Olusegun; Lee, Jaejin; Williams, John D.

2014-07-01

This article reports the magnetic and microwave properties of a Barium ferrite powder suspended in a polymer matrix. The sizes for Barium hexaferrite powder are 3-6 μm for coarse and 0.8-1.0 μm for the fine powder. Ratios 1:1 and 3:1 (by mass) of ferrite to SU8 samples were characterized and analyzed for predicting the necessary combinations of these powders with SU8 2000 Negative photoresist. The magnetization properties of these materials were equally determined and were analyzed using Vibrating Sample Magnetometer (VSM). The Thru, Reflect, Line (TRL) calibration technique was employed in determining complex relative permittivity and permeability of the powders and composites with SU8 between 26.5 and 40 GHz.

Electromagnetic properties of photodefinable barium ferrite polymer composites

Directory of Open Access Journals (Sweden)

Olusegun Sholiyi

2014-07-01

Full Text Available This article reports the magnetic and microwave properties of a Barium ferrite powder suspended in a polymer matrix. The sizes for Barium hexaferrite powder are 3–6 μm for coarse and 0.8–1.0 μm for the fine powder. Ratios 1:1 and 3:1 (by mass of ferrite to SU8 samples were characterized and analyzed for predicting the necessary combinations of these powders with SU8 2000 Negative photoresist. The magnetization properties of these materials were equally determined and were analyzed using Vibrating Sample Magnetometer (VSM. The Thru, Reflect, Line (TRL calibration technique was employed in determining complex relative permittivity and permeability of the powders and composites with SU8 between 26.5 and 40 GHz.

Nanomechanical Pyrolytic Carbon Resonators: Novel Fabrication Method and Characterization of Mechanical Properties

Directory of Open Access Journals (Sweden)

Maksymilian Kurek

2016-07-01

Full Text Available Micro- and nanomechanical string resonators, which essentially are highly stressed bridges, are of particular interest for micro- and nanomechanical sensing because they exhibit resonant behavior with exceptionally high quality factors. Here, we fabricated and characterized nanomechanical pyrolytic carbon resonators (strings and cantilevers obtained through pyrolysis of photoresist precursors. The developed fabrication process consists of only three processing steps: photolithography, dry etching and pyrolysis. Two different fabrication strategies with two different photoresists, namely SU-8 2005 (negative and AZ 5214e (positive, were compared. The resonant behavior of the pyrolytic resonators was characterized at room temperature and in high vacuum using a laser Doppler vibrometer. The experimental data was used to estimate the Young’s modulus of pyrolytic carbon and the tensile stress in the string resonators. The Young’s moduli were calculated to be 74 ± 8 GPa with SU-8 and 115 ± 8 GPa with AZ 5214e as the precursor. The tensile stress in the string resonators was 33 ± 7 MPa with AZ 5214e as the precursor. The string resonators displayed maximal quality factor values of up to 3000 for 525-µm-long structures.

Design, Fabrication and Testing of Tunable RF Meta-atoms

Science.gov (United States)

2012-06-14

representative adhesive layers include photoresist, polymer adhesive and spin-on glass adhesive [44] 33 2.2.1.2. Micromolding Micromolding is commonly...lithography system is set up to use a 488 nm wavelength diode laser. It has the capability to generate 1 cm 2 fishnet patterns using SU8 -2025 blended with

Hierarchical Micro/Nano Structures by Combined Self-Organized Dewetting and Photopatterning of Photoresist Thin Films.

Science.gov (United States)

Sachan, Priyanka; Kulkarni, Manish; Sharma, Ashutosh

2015-11-17

Photoresists are the materials of choice for micro/nanopatterning and device fabrication but are rarely used as a self-assembly material. We report for the first time a novel interplay of self-assembly and photolithography for fabrication of hierarchical and ordered micro/nano structures. We create self-organized structures by the intensified dewetting of unstable thin (∼10 nm to 1 μm) photoresist films by annealing them in an optimal solvent and nonsolvent liquid mixture that allows spontaneous dewetting to form micro/nano smooth dome-like structures. The density, size (∼100 nm to millimeters), and curvature/contact angle of the dome/droplet structures are controlled by the film thickness, composition of the dewetting liquid, and time of annealing. Ordered dewetted structures are obtained simply by creating spatial variation of viscosity by ultraviolet exposure or by photopatterning before dewetting. Further, the structures thus fabricated are readily photopatterned again on the finer length scales after dewetting. We illustrate the approach by fabricating several three-dimensional structures of varying complexity with secondary and tertiary features.

The fabrication of diversiform nanostructure forests based on residue nanomasks synthesized by oxygen plasma removal of photoresist

Energy Technology Data Exchange (ETDEWEB)

Mao Haiyang; Wu Di; Wu Wengang; Hao Yilong [National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Institute of Microelectronics, Peking University, Beijing 100871 (China); Xu Jun, E-mail: wuwg@ime.pku.edu.c [Electron Microscopy Laboratory, Peking University, Beijing 100871 (China)

2009-11-04

A simple lithography-free approach for fabricating diversiform nanostructure forests is presented. The key technique of the approach is that randomly distributed nanoscale residues can be synthesized on substrates simply by removing photoresist with oxygen plasma bombardment. These nanoresidues can function as masks in the subsequent etching process for nanopillars. By further spacer and then deep etching processes, a variety of forests composed of regular, tulip-like or hollow-head nanopillars as well as nanoneedles are successfully achieved in different etching conditions. The pillars have diameters of 30-200 nm and heights of 400 nm-3 {mu}m. The needles reach several microns in height, with their tips less than 10 nm in diameter. Moreover, microstructures containing these nanostructure forests, such as surface microchannels, have also been fabricated. This approach is compatible with conventional micro/nano-electromechanical system (MEMS/NEMS) fabrication.

The fabrication of diversiform nanostructure forests based on residue nanomasks synthesized by oxygen plasma removal of photoresist

International Nuclear Information System (INIS)

Mao Haiyang; Wu Di; Wu Wengang; Hao Yilong; Xu Jun

2009-01-01

A simple lithography-free approach for fabricating diversiform nanostructure forests is presented. The key technique of the approach is that randomly distributed nanoscale residues can be synthesized on substrates simply by removing photoresist with oxygen plasma bombardment. These nanoresidues can function as masks in the subsequent etching process for nanopillars. By further spacer and then deep etching processes, a variety of forests composed of regular, tulip-like or hollow-head nanopillars as well as nanoneedles are successfully achieved in different etching conditions. The pillars have diameters of 30-200 nm and heights of 400 nm-3 μm. The needles reach several microns in height, with their tips less than 10 nm in diameter. Moreover, microstructures containing these nanostructure forests, such as surface microchannels, have also been fabricated. This approach is compatible with conventional micro/nano-electromechanical system (MEMS/NEMS) fabrication.

Mass anomalous dimension of SU(2) with Nf=8 using the spectral density method

DEFF Research Database (Denmark)

Suorsa, Joni M.; Leino, Viljami; Rantaharju, Jarno

2015-01-01

SU(2) with Nf=8 is believed to have an infrared conformal fixed point. We use the spectral density method to evaluate the coupling constant dependence of the mass anomalous dimension for massless HEX smeared, clover improved Wilson fermions with Schr\\"odinger functional boundary conditions....

Infiltration SuDS Map

OpenAIRE

Dearden, Rachel

2012-01-01

Infiltration SuDS are sustainable drainage systems (SuDS) that allow surface water to infiltrate to the ground. Examples include soakaways, infiltration basins, infiltration trenches and permeable pavements. Before planning to install Infiltration SuDS, the suitability of the ground should be assessed. The British Geological Survey has developed a bespoke Infiltration SuDS Map that enables a preliminary assessment of the suitability of the ground for infiltration SuDS. Th...

Fabrication of SU-8 low frequency electrostatic energy harvester

KAUST Repository

Ramadan, Khaled S.

2011-11-01

A 1500μm × 1500μm × 150μm out-of-plane, gap closing, electrostatic energy harvester is designed and fabricated to harvest low-frequency ambient vibrations. SU-8 is used to fabricate the proof mass (1200μm × 1200μm × 150μm) and the 5 m springs. Different harvesters were designed to harvest at 50, 75 and 110 Hz. At 110 Hz, Simulations show that with an input vibration of 10 μm amplitude at the frequency of resonance of the structure, the energy harvester should generate an average output power density of 0.032μW/mm3. This is the most area-efficient low-frequency electrostatic harvester to-date. © 2011 IEEE.

Studying the mechanism of hybrid nanoparticle EUV photoresists

KAUST Repository

Zhang, Ben; Li, Li; Jiang, Jing; Neisser, Mark; Chun, Jun Sung; Ober, Christopher K.; Giannelis, Emmanuel P.

2015-01-01

This work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

Studying the mechanism of hybrid nanoparticle EUV photoresists

KAUST Repository

Zhang, Ben

2015-03-23

This work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

Design and fabrication of an ac-electro-osmosis micropump with 3D high-aspect-ratio electrodes using only SU-8

International Nuclear Information System (INIS)

Rouabah, Hamza A; Morgan, Hywel; Green, Nicolas G; Park, Benjamin Y; Zaouk, Rabih B; Madou, Marc J

2011-01-01

Lab-on-a-chip devices require integrated pumping and fluid control in microchannels. A recently developed mechanism that can produce fluid flow is an integrated ac-electro-osmosis micropump. However, like most electrokinetic pumps, ac-electro-osmotic pumps are incapable of handling backpressure as the pumping force mechanism acts on the surface of the fluid rather than the bulk. This paper presents a novel 3D electrode structure designed to overcome this limitation. The electrodes are fabricated using carbon-MEMS technology based on the pyrolysis of the photo-patternable polymer SU-8. The novel ac-electro-osmosis micropump shows an increase in the flow velocity compared to planar electrodes.

Microfluidic sensors based on perforated cantilevers

DEFF Research Database (Denmark)

Noeth, Nadine-Nicole

Arbejdet presenteret i denne PhD afhandling omhandler udviklingen af en mikrofluide sensor basered på bjælke teknologi. Bjælkerne er fremstillet i den negative photo-resist SU-8 og i SiN. I bjælkerne er der inkorporeret et array af huller. To nye sensorer er udviklet på baggrund af de perforerede...

Integrated Real-Time Control and Imaging System for Microbiorobotics and Nanobiostructures

Science.gov (United States)

2016-01-11

coordination of bacteria. A. Control of Bacteria-Powered Microrobots Using Static Obstacle Avoidance Algorithm A bacteria-powered microrobot ( BPM ) is...autonomous navigation algorithm for BPM obstacle avoidance. Moreover, we have demonstrated obstacle avoidance in cluttered environments modifying...different parameters in our algorithm [1]. Briefly, BPMs were fabricated by first using conventional photolithography with SU-8 negative photoresist to

Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application

Science.gov (United States)

Klötzer, Madlen; Afshar, Maziar; Feili, Dara; Seidel, Helmut; König, Karsten; Straub, Martin

2015-03-01

Indium-tin-oxide (ITO) is a widely used electrode material for liquid crystal cell applications because of its transparency in the visible spectral range and its high electrical conductivity. Important examples of applications are displays and optical phase modulators. We report on subwavelength periodic structuring and precise laser cutting of 150 nm thick indium-tin-oxide films on glass substrates, which were deposited by magnetron reactive DC-sputtering from an indiumtin target in a low-pressure oxygen atmosphere. In order to obtain nanostructured electrodes laser-induced periodic surface structures with a period of approximately 100 nm were generated using tightly focused high-repetition rate sub-15 femtosecond pulsed Ti:sapphire laser light, which was scanned across the sample by galvanometric mirrors. Three-dimensional spacers were produced by multiphoton photopolymerization in ma-N 2410 negative-tone photoresist spin-coated on top of the ITO layers. The nanostructured electrodes were aligned in parallel to set up an electrically switchable nematic liquid crystal cell.

Synthesis and field emission properties of carbon nanotubes grown in ethanol flame based on a photoresist-assisted catalyst annealing process

International Nuclear Information System (INIS)

Yang Xiaoxia; Fang Guojia; Liu Nishuang; Wang Chong; Zheng Qiao; Zhou Hai; Zhao Dongshan; Long Hao; Liu Yuping; Zhao Xingzhong

2009-01-01

Carbon nanotubes (CNTs) have been grown directly on a Si substrate without a diffusion barrier in ethanol diffusion flame using Ni as the catalyst after a photoresist-assisted catalyst annealing process. The growth mechanism of as-synthesized CNTs is confirmed by scanning electron microscopy, high resolution transmission-electron microscopy and energy-dispersive spectroscopy. The photoresist is the key for the formation of active catalyst particles during annealing process, which then result in the growth of CNTs. The catalyst annealing temperature has been found to affect the morphologies and field electron emission properties of CNTs significantly. The field emission properties of as-grown CNTs are investigated with a diode structure and the obtained CNTs exhibit enhanced characteristics. This technique will be applicable to a low-cost fabrication process of electron-emitter arrays.

Optimized piranha etching process for SU8-based MEMS and MOEMS construction

OpenAIRE

Holmes, Matthew; Keeley, Jared; Hurd, Katherine; Schmidt, Holger; Hawkins, Aaron

2010-01-01

We demonstrate the optimization of the concentration, temperature and cycling of a piranha (H2O2:H2SO4) mixture that produces high yields while quickly etching hollow structures made using a highly crosslinked SU8 polymer sacrificial core. The effects of the piranha mixture on the thickness, refractive index and roughness of common micro-electromechanical systems and micro-opto-electromechanical systems fabrication materials (SiN, SiO2 and Si) were determined. The effectiveness of the optimal...

Sub-15 fs multiphoton lithography of three-dimensional structures for live cell applications

International Nuclear Information System (INIS)

Licht, Martin; Uchugonova, Aisada; König, Karsten; Straub, Martin

2012-01-01

Development, morphology and intratissue location of cells are influenced by the 3D nano- and microenvironment. In this paper we demonstrate multiphoton photopolymerization to generate three-dimensional structures for cell culture applications with micro- and nanotopographic features using SU-8 photoresist and mr-NIL 6000 nanoimprint resist. Moving the focal spot of high-repetition rate near-infrared sub-15 fs pulsed laser light by a galvanometric beam scanner in combination with a piezoelectric vertical stage, nearly arbitrary trajectories of polymerized photoresist were generated. This technique can be used to generate cage structures with submicron interior features for live cell applications. Preliminary experiments with PC-3 and HT-1080 cells indicate the influence of the structures on cell behavior. (paper)

Repeatable Manufacture of Wings for Flapping Wing Micro Air Vehicles Using Microelectromechanical System (MEMS) Fabrication Techniques

Science.gov (United States)

2011-03-01

51 Figure 29: Original SU8 -on-titanium crude test moth wing and its ink-on-transparency mask...out of what materials the researchers could find, normally carbon fiber spars with a polymer membrane. Testing, while well-planned, was improvised...photoresist polymers from a controlled UV light exposure, in order to control which portions of the substrate remain masked from a given etchant

Lithographic stress control for the self-assembly of polymer MEMS structures

International Nuclear Information System (INIS)

Lee, S-W; Sameoto, D; Parameswaran, M; Mahanfar, A

2008-01-01

We present a novel self-assembly mechanism to produce an assortment of predetermined three-dimensional micromechanical structures in polymer MEMS technology using lithographically defined areas of stress and mechanical reinforcement within a single structural material. This self-assembly technology is based on the tensile stress that arises during the cross-linking of the negative tone, epoxy-based photoresist SU-8. Two different thicknesses of SU-8 are used in a single compliant structure. The first SU-8 layer forms the main structural element and the second SU-8 layer determines the aspects of self-assembly. The second SU-8 layer thickness acts to both to create a stress differential within the structure as well as define the direction in which the induced stress will cause the structure to deform. In this manner, both the magnitude and direction of self-assembled structures can be controlled using a single lithographic step. Although this technique uses a single structural material, the basic concept may be adapted for other processes, with different material choices, for a wide variety of applications

10 CFR 960.5-2-8 - Surface characteristics.

Science.gov (United States)

2010-01-01

... 10 Energy 4 2010-01-01 2010-01-01 false Surface characteristics. 960.5-2-8 Section 960.5-2-8... Closure § 960.5-2-8 Surface characteristics. (a) Qualifying condition. The site shall be located such that, considering the surface characteristics and conditions of the site and surrounding area, including surface...

Optimized piranha etching process for SU8-based MEMS and MOEMS construction

International Nuclear Information System (INIS)

Holmes, Matthew; Keeley, Jared; Hurd, Katherine; Hawkins, Aaron; Schmidt, Holger

2010-01-01

We demonstrate the optimization of the concentration, temperature and cycling of a piranha (H 2 O 2 :H 2 SO 4 ) mixture that produces high yields while quickly etching hollow structures made using a highly crosslinked SU8 polymer sacrificial core. The effects of the piranha mixture on the thickness, refractive index and roughness of common micro-electromechanical systems and micro-opto-electromechanical systems fabrication materials (SiN, SiO 2 and Si) were determined. The effectiveness of the optimal piranha mixture was demonstrated in the construction of hollow anti-resonant reflecting optical waveguides

Optimized piranha etching process for SU8-based MEMS and MOEMS construction

Science.gov (United States)

Holmes, Matthew; Keeley, Jared; Hurd, Katherine; Schmidt, Holger; Hawkins, Aaron

2010-11-01

We demonstrate the optimization of the concentration, temperature and cycling of a piranha (H2O2:H2SO4) mixture that produces high yields while quickly etching hollow structures made using a highly crosslinked SU8 polymer sacrificial core. The effects of the piranha mixture on the thickness, refractive index and roughness of common micro-electromechanical systems and micro-opto-electromechanical systems fabrication materials (SiN, SiO2 and Si) were determined. The effectiveness of the optimal piranha mixture was demonstrated in the construction of hollow anti-resonant reflecting optical waveguides.

Simple Multi-level Microchannel Fabrication by Pseudo-Grayscale Backside Diffused Light Lithography.

Science.gov (United States)

Lai, David; Labuz, Joseph M; Kim, Jiwon; Luker, Gary D; Shikanov, Ariella; Takayama, Shuichi

2013-11-14

Photolithography of multi-level channel features in microfluidics is laborious and/or costly. Grayscale photolithography is mostly used with positive photoresists and conventional front side exposure, but the grayscale masks needed are generally costly and positive photoresists are not commonly used in microfluidic rapid prototyping. Here we introduce a simple and inexpensive alternative that uses pseudo-grayscale (pGS) photomasks in combination with backside diffused light lithography (BDLL) and the commonly used negative photoresist, SU-8. BDLL can produce smooth multi-level channels of gradually changing heights without use of true grayscale masks because of the use of diffused light. Since the exposure is done through a glass slide, the photoresist is cross-linked from the substrate side up enabling well-defined and stable structures to be fabricated from even unspun photoresist layers. In addition to providing unique structures and capabilities, the method is compatible with the "garage microfluidics" concept of creating useful tools at low cost since pGS BDLL can be performed with the use of only hot plates and a UV transilluminator: equipment commonly found in biology labs. Expensive spin coaters or collimated UV aligners are not needed. To demonstrate the applicability of pGS BDLL, a variety of weir-type cell traps were constructed with a single UV exposure to separate cancer cells (MDA-MB-231, 10-15 μm in size) from red blood cells (RBCs, 2-8 μm in size) as well as follicle clusters (40-50 μm in size) from cancer cells (MDA-MB-231, 10-15 μm in size).

Highly efficient silver patterning without photo-resist using simple silver precursors

International Nuclear Information System (INIS)

Byun, Younghun; Hwang, Eoc-Chae; Lee, Sang-Yun; Lyu, Yi-Yeol; Yim, Jin-Heong; Kim, Jin-Young; Chang, Seok; Pu, Lyong Sun; Kim, Ji Man

2005-01-01

Highly efficient method for silver patterning without photo-resist was developed by using high photosensitive organo-silver precursors, which were prepared by a simple reaction of silver salts and excess of amines. The FT-IR and GC-MS spectra were recorded depending on UV exposure time, for (n-PrNH 2 )Ag(NO 3 ).0.5MeCN and (n-PrNH 2 )Ag(NO 2 ).0.5MeCN, to understand the photolysis mechanism. The results indicate not only dissociation of coordinated amine and acetonitrile, but also decomposition of corresponding anion upon UV irradiation. When a precursor thin film was exposed to broadband UV irradiation, a partially reduced and insoluble silver species were formed within several minutes. After development, the irradiated areas were treated with a reducing agent to obtain pure metallic patterns. Subsequently, annealing step was followed at 100-350 deg. C to increase the adhesion of interface and cohesion of silver particles. The line resolution of 5 μm was obtained by the present silver precursors. Film thickness was also controllable from 50 to 250 nm by repetition of the above procedure. The average electrical conductivity was in the range of 3-43 Ω cm, measured by four-point probe technique. AES depth profile of the silver pattern thus obtained showed carbon and oxygen contents are less than 1% through the whole range. Even though sulfur contaminant exists on the surface, it was believed that nearly pure silver pattern was generated

SU-8 Based MEMS Process with Two Metal Layers using α-Si as a Sacrificial Material

KAUST Repository

Ramadan, Khaled S.

2012-01-01

MEMS applications. α-Si can be deposited at large thicknesses for MEMS applications and also can be released in a dry method using XeF2 which can solve stiction problems related to MEMS applications. In this thesis, an SU-8 MEMS process is developed

Comparison of three different scales techniques for the dynamic mechanical characterization of two polymers (PDMS and SU8)

Science.gov (United States)

Le Rouzic, J.; Delobelle, P.; Vairac, P.; Cretin, B.

2009-10-01

In this article the dynamic mechanical characterization of PDMS and SU8 resin using dynamic mechanical analysis, nanoindentation and the scanning microdeformation microscope have been presented. The methods are hereby explained, extended for viscoelastic behaviours, and their compatibility underlined. The storage and loss moduli of these polymers over a wide range of frequencies (from 0.01 Hz to somekHz) have been measured. These techniques are shown fairly matching and the two different viscoelastic behaviours of these two polymers have been exhibited. Indeed, PDMS shows moduli which still increase at 5kHz whereas SU8 ones decrease much sooner. From a material point of view, the Havriliak and Negami model to estimate instantaneous, relaxed moduli and time constant of these materials has been identified.

Alkali-developable silicone-based negative photoresist (SNP) for deep UV, electron beam, and X-ray lithographies

International Nuclear Information System (INIS)

Ban, Hiroshi; Tanaka, Akinobu; Kawai, Yoshio; Deguchi, Kimiyoshi

1989-01-01

A new silicone-based negative photoresist (SNP) developable with alkaline aqueous solutions is prepared. SNP composed of acetylated phenylsilsesquioxane oligomer and azidopyrene is applied to deep UV, electron beam (EB), and X-ray lithographies. SNP slightly swells in alkaline developers, thus exhibiting exceptionally high resolution characteristics for a negative resist. The resistance of SNP to oxygen reactive ion etching is approximately 30 times greater than that of conventional novolac resists. (author)

Microfabrication of pre-aligned fiber bundle couplers using ultraviolet lithography of SU-8

OpenAIRE

Yang, Ren; Soper, Steven A.; Wang, Wanjun

2006-01-01

This paper describes the design, microfabrication and testing of a pre-aligned array of fiber couplers using direct UV-lithography of SU-8. The fiber coupler array includes an out-of-plane refractive microlens array and two fiberport collimator arrays. With the optical axis of the pixels parallel to the substrate, each pixel of the microlens array can be pre-aligned with the corresponding pixels of the fiberport collimator array as defined by the lithography mask design. This out-of-plane pol...

Infinitely high etch selectivity during CH4/H2/Ar inductively coupled plasma (ICP) etching of indium tin oxide (ITO) with photoresist mask

International Nuclear Information System (INIS)

Kim, D.Y.; Ko, J.H.; Park, M.S.; Lee, N.-E.

2008-01-01

Under certain conditions during ITO etching using CH 4 /H 2 /Ar inductively coupled plasmas, the etch rate selectivity of ITO to photoresist (PR) was infinitely high because the ITO films continued to be etched, but a net deposition of the α-C:H layer occurred on the top of the PR. Analyses of plasmas and etched ITO surfaces suggested that the continued consumption of the carbon and hydrogen in the deposited α-C:H layer by their chemical reaction with In and Sn atoms in the ITO resulting in the generation of volatile metal-organic etch products and by the ion-enhanced removal of the α-C:H layer presumably play important roles in determining the ITO etch rate and selectivity

Pyrolytic 3D Carbon Microelectrodes for Electrochemistry

DEFF Research Database (Denmark)

Hemanth, Suhith; Caviglia, Claudia; Amato, Letizia

2016-01-01

electrochemical activity, chemical stability, and ease in surface functionalization [1]. The most common carbon microfabrication techniques (i.e. screen printing) produce two-dimensional (2D) electrodes, which limit the detection sensitivity. Hence several 3D microfabrication techniques have been explored......This work presents the fabrication and characterization of multi-layered three-dimensional (3D) pyrolysed carbon microelectrodes for electrochemical applications. For this purpose, an optimized UV photolithography and pyrolysis process with the negative tone photoresist SU-8 has been developed...... carbon [2]. This process enables fabrication of 2D and 3D electrodes with possibility for tailoring ad-hoc designs and unique sensitivities for specific applications. Due to this, pyrolysed carbon is becoming increasingly attractive for numerous applications, such as novel sensors and scaffolds for cell...

Effect of size and moisture on the mechanical behavior of SU-8 thin films

International Nuclear Information System (INIS)

Robin, C J; Jonnalagadda, K N

2016-01-01

The mechanical properties of SU-8 were investigated in conjunction with size effect, mechanical anisotropy and moisture absorption. Uniaxial tensile experiments were conducted on SU-8 films of 500 nm and 2 μm thickness. A spin coating process was used to fabricate the films with one set from a single coat (single layer) and the others containing multiple coats (multilayer) with pre-baking in between. The stress versus strain response was obtained from in situ optical experiments and a digital image correlation method. Compared to single layer films, the multilayer films showed a significant increase in mechanical properties as well as in-plane anisotropy. This anisotropy was confirmed using Fourier transform infrared spectroscopy and attributed to the spin coating process, which resulted in higher crosslinking density in the film, and molecular orientation in the radial direction. Moisture absorption studies revealed that the mechanical properties were affected by water, which exists in both the free and bonded form in the polymer and acts as a plasticizer. The effect of moisture was similar in both the single and multilayer films, but was higher for the latter due to multiple processing steps as well as the existence of higher percentage of epoxy polar groups. (paper)

Effect of size and moisture on the mechanical behavior of SU-8 thin films

Science.gov (United States)

Robin, C. J.; Jonnalagadda, K. N.

2016-02-01

The mechanical properties of SU-8 were investigated in conjunction with size effect, mechanical anisotropy and moisture absorption. Uniaxial tensile experiments were conducted on SU-8 films of 500 nm and 2 μm thickness. A spin coating process was used to fabricate the films with one set from a single coat (single layer) and the others containing multiple coats (multilayer) with pre-baking in between. The stress versus strain response was obtained from in situ optical experiments and a digital image correlation method. Compared to single layer films, the multilayer films showed a significant increase in mechanical properties as well as in-plane anisotropy. This anisotropy was confirmed using Fourier transform infrared spectroscopy and attributed to the spin coating process, which resulted in higher crosslinking density in the film, and molecular orientation in the radial direction. Moisture absorption studies revealed that the mechanical properties were affected by water, which exists in both the free and bonded form in the polymer and acts as a plasticizer. The effect of moisture was similar in both the single and multilayer films, but was higher for the latter due to multiple processing steps as well as the existence of higher percentage of epoxy polar groups.

Using a micro-molding process to fabricate polymeric wavelength filters

Science.gov (United States)

Chuang, Wei-Ching; Lee, An-Chen; Ho, Chi-Ting

2008-08-01

A procedure for fabricating a high aspect ratio periodic structure on a UV polymer at submicron order using holographic interferometry and molding processes is described. First, holographic interferometry using a He-Cd (325 nm) laser was used to create the master of the periodic line structure on an i-line sub-micron positive photoresist film. A 20 nm nickel thin film was then sputtered on the photoresist. The final line pattern on a UV polymer was obtained from casting against the master mold. Finally, a SU8 polymer was spun on the polymer grating to form a planar waveguide or a channel waveguide. The measurement results show that the waveguide length could be reduced for the waveguide having gratings with a high aspect ratio.

Fermion unification model based on the intrinsic SU(8 symmetry of a generalized Dirac equation

Directory of Open Access Journals (Sweden)

Eckart eMarsch

2015-10-01

Full Text Available A natural generalization of the original Dirac spinor into a multi-component spinor is achieved, which corresponds to the single lepton and the three quarks of the first family of the standard model of elementary particle physics. Different fermions result from similarity transformations of the Dirac equation, but apparently there can be no more fermions according to the maximal multiplicity revealed in this study. Rotations in the fermion state space are achieved by the unitary generators of the U(1 and the SU(3 groups, corresponding to quantum electrodynamics (QED based on electric charge and chromodynamics (QCD based on colour charge. In addition to hypercharge the dual degree of freedom of hyperspin emerges, which occurs due to the duplicity implied by the two related (Weyl and Dirac representations of the Dirac equation. This yields the SU(2 symmetry of the weak interaction, which can be married to U(1 to generate the unified electroweak interaction as in the standard model. Therefore, the symmetry group encompassing all the three groups mentioned above is SU(8, which can accommodate and unify the observed eight basic stable fermions.

Surface chemical modification for exceptional wear life of MEMS materials

Directory of Open Access Journals (Sweden)

R. Arvind Singh

2011-12-01

Full Text Available Micro-Electro-Mechanical-Systems (MEMS are built at micro/nano-scales. At these scales, the interfacial forces are extremely strong. These forces adversely affect the smooth operation and cause wear resulting in the drastic reduction in wear life (useful operating lifetime of actuator-based devices. In this paper, we present a surface chemical modification method that reduces friction and significantly extends the wear life of the two most popular MEMS structural materials namely, silicon and SU-8 polymer. The method includes surface chemical treatment using ethanolamine-sodium phosphate buffer, followed by coating of perfluoropolyether (PFPE nanolubricant on (i silicon coated with SU-8 thin films (500 nm and (ii MEMS process treated SU-8 thick films (50 μm. After the surface chemical modification, it was observed that the steady-state coefficient of friction of the materials reduced by 4 to 5 times and simultaneously their wear durability increased by more than three orders of magnitude (> 1000 times. The significant reduction in the friction coefficients is due to the lubrication effect of PFPE nanolubricant, while the exceptional increase in their wear life is attributed to the bonding between the -OH functional group of ethanolamine treated SU-8 thin/thick films and the -OH functional group of PFPE. The surface chemical modification method acts as a common route to enhance the performance of both silicon and SU-8 polymer. It is time-effective (process time ≤ 11 min, cost-effective and can be readily integrated into MEMS fabrication/assembly processes. It can also work for any kind of structural material from which the miniaturized devices are/can be made.

Hydrophobic coating of microfluidic chips structured by SU-8 polymer for segmented flow operation

International Nuclear Information System (INIS)

Schumacher, J T; Grodrian, A; Metze, J; Kremin, C; Hoffmann, M

2008-01-01

We present a hydrophobization procedure for SU-8-based microfluidic chips on borofloat substrates. Different layouts of gold electrodes passivated by the polymer have been investigated. The chips are used for segmented flow in a two-fluid mode that requires a distinct hydrophobicity of the channel walls which is generated by the use of specific silane. In this paper we describe the production and silanization of the chips and demonstrate segmented flow operation

Paper Microzone Plates as Analytical Tools for Studying Enzyme Stability: A Case Study on the Stabilization of Horseradish Peroxidase Using Trehalose and SU-8 Epoxy Novolac Resin.

Science.gov (United States)

Ganaja, Kirsten A; Chaplan, Cory A; Zhang, Jingyi; Martinez, Nathaniel W; Martinez, Andres W

2017-05-16

Paper microzone plates in combination with a noncontact liquid handling robot were demonstrated as tools for studying the stability of enzymes stored on paper. The effect of trehalose and SU-8 epoxy novolac resin (SU-8) on the stability of horseradish peroxidase (HRP) was studied in both a short-term experiment, where the activity of various concentrations of HRP dried on paper were measured after 1 h, and a long-term experiment, where the activity of a single concentration of HRP dried and stored on paper was monitored for 61 days. SU-8 was found to stabilize HRP up to 35 times more than trehalose in the short-term experiment for comparable concentrations of the two reagents, and a 1% SU-8 solution was found to stabilize HRP approximately 2 times more than a 34% trehalose solution in both short- and long-term experiments. The results suggest that SU-8 is a promising candidate for use as an enzyme-stabilizing reagent for paper-based diagnostic devices and that the short-term experiment could be used to quickly evaluate the capacity of various reagents for stabilizing enzymes to identify and characterize new enzyme-stabilizing reagents.

Strain-Mediated Inverse Photoresistivity in SrRuO3/La0.7Sr0.3MnO3Superlattices

KAUST Repository

Liu, Heng-Jui

2015-12-09

© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. In the pursuit of novel functionalities by utilizing the lattice degree of freedom in complex oxide heterostructure, the control mechanism through direct strain manipulation across the interfaces is still under development, especially with various stimuli, such as electric field, magnetic field, light, etc. In this study, the superlattices consisting of colossal-magnetoresistive manganites La0.7Sr0.3MnO3 (LSMO) and photostrictive SrRuO3 (SRO) have been designed to investigate the light-dependent controllability of lattice order in the corresponding functionalities and rich interface physics. Two substrates, SrTiO3 (STO) and LaAlO3 (LAO), have been employed to provide the different strain environments to the superlattice system, in which the LSMO sublayers exhibit different orbital occupations. Subsequently, by introducing light, we can modulate the strain state and orbital preference of LSMO sublayers through light-induced expansion of SRO sublayers, leading to surprisingly opposite changes in photoresistivity. The observed photoresistivity decreases in the superlattice grown on STO substrate while increases in the superlattice grown on LAO substrate under light illumination. This work has presented a model system that demonstrates the manipulation of orbital-lattice coupling and the resultant functionalities in artificial oxide superlattices via light stimulus. A fascinating model system of optic-driven functionalities has been achieved by artificial superlattices consisting of manganite La0.7Sr0.3MnO3 (LSMO) and photostrictive SrRuO3 (SRO). With design of different initial strain and orbital states in superlattices, we can even control the photoresistivity of the superlattices in an opposite trend that cannot be achieved in pure single film.

Modeling of solid-state and excimer laser processes for 3D micromachining

Science.gov (United States)

Holmes, Andrew S.; Onischenko, Alexander I.; George, David S.; Pedder, James E.

2005-04-01

An efficient simulation method has recently been developed for multi-pulse ablation processes. This is based on pulse-by-pulse propagation of the machined surface according to one of several phenomenological models for the laser-material interaction. The technique allows quantitative predictions to be made about the surface shapes of complex machined parts, given only a minimal set of input data for parameter calibration. In the case of direct-write machining of polymers or glasses with ns-duration pulses, this data set can typically be limited to the surface profiles of a small number of standard test patterns. The use of phenomenological models for the laser-material interaction, calibrated by experimental feedback, allows fast simulation, and can achieve a high degree of accuracy for certain combinations of material, laser and geometry. In this paper, the capabilities and limitations of the approach are discussed, and recent results are presented for structures machined in SU8 photoresist.

Refractive index modulation of SU-8 polymer optical waveguides by means of hybrid photothermal process

OpenAIRE

Salazar-Miranda, D.; Castillón, F. F.; Sánchez-Sánchez, J. J.; Angel-Valenzuela, J. L.; Márquez, H.

2010-01-01

This paper describes the fabrication and characterization of multimode polymer optical waveguides obtained using a SU-8-2005 polymer by means of photolithographic process. Critical information about refractive index modulation of polymer waveguides as function of fabrication parameters as pre-baked and ultraviolet exposure times is presented. Physical properties of the waveguides were determined by means prism-coupling technique, optical and SEM microscopy. Este trabajo describe la fabrica...

Microwave-Assisted Syntheses in Recyclable Ionic Liquids: Photoresists Based on Renewable Resources.

Science.gov (United States)

Petit, Charlotte; Luef, Klaus P; Edler, Matthias; Griesser, Thomas; Kremsner, Jennifer M; Stadler, Alexander; Grassl, Bruno; Reynaud, Stéphanie; Wiesbrock, Frank

2015-10-26

The copoly(2-oxazoline) pNonOx80 -stat-pDc(=) Ox20 can be synthesized from the cationic ring-opening copolymerization of 2-nonyl-2-oxazoline NonOx and 2-dec-9'-enyl-2-oxazoline Dc(=) Ox in the ionic liquid n-hexyl methylimidazolium tetrafluoroborate under microwave irradiation in 250 g/batch quantities. The polymer precipitates upon cooling, enabling easy recovery of the polymer and the ionic liquid. Both monomers can be obtained from fatty acids from renewable resources. pNonOx80 -stat-pDc(=) Ox20 can be used as polymer in a photoresist (resolution of 1 μm) based on UV-induced thiol-ene reactions. © 2015 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA.

Development of an SU-8 MEMS process with two metal electrodes using amorphous silicon as a sacrificial material

KAUST Repository

Ramadan, Khaled S.; Nasr, Tarek Adel Hosny; Foulds, Ian G.

2013-01-01

method using XeF2, which alleviates release-based stiction problems related to MEMS applications. In this work, an SU-8 MEMS process was developed using ;-Si as a sacrificial layer. Two conductive metal electrodes were integrated in this process to allow

Reduced Zeta potential through use of cationic adhesion promoter for improved resist process performance and minimizing material consumption

Science.gov (United States)

Hodgson, Lorna; Thompson, Andrew

2012-03-01

This paper presents the results of a non-HMDS (non-silane) adhesion promoter that was used to reduce the zeta potential for very thin (proprietary) polymer on silicon. By reducing the zeta potential, as measured by the minimum sample required to fully coat a wafer, the amount of polymer required to coat silicon substrates was significantly reduced in the manufacture of X-ray windows used for high transmission of low-energy X-rays. Moreover, this approach used aqueous based adhesion promoter described as a cationic surface active agent that has been shown to improve adhesion of photoresists (positive, negative, epoxy [SU8], e-beam and dry film). As well as reducing the amount of polymer required to coat substrates, this aqueous adhesion promoter is nonhazardous, and contains non-volatile solvents.

Up-conversion in an Er-containing nanocomposite and microlasers based on it

Science.gov (United States)

Sobeshchuk, N. O.; Denisyuk, I. Yu.

2017-06-01

The results of an investigation of three-dimensional polymer microcavities doped with inorganic luminescent particles are presented. Microlasers in the form of rectangular parallelepipeds were fabricated based on the SU8 2025 photoresist by means of compact UV lithography. Luminescent particles containing erbium oxide were obtained by low-temperature synthesis of the corresponding chlorides in a nonaqueous medium. The obtained spectra confirm the presence of a narrowband laser radiation exhibiting a Stokes shift.

Focusing properties of x-ray polymer refractive lenses from SU-8 resist layer

Science.gov (United States)

Snigirev, Anatoly A.; Snigireva, Irina; Drakopoulos, Michael; Nazmov, Vladimir; Reznikova, Elena; Kuznetsov, Sergey; Grigoriev, Maxim; Mohr, Jurgen; Saile, Volker

2003-12-01

Compound refractive lenses printed in Al and Be are becoming the key X-ray focusing and imaging components of beamline optical layouts at the 3rd generation synchrotron radiation sources. Recently proposed planar optical elements based on Si, diamond etc. may substantially broaden the spectrum of the refractive optics applicability. Planar optics has focal distances ranging from millimeters to tens of meters offering nano- and micro-focusing lenses, as well as beam condensers and collimators. Here we promote deep X-ray lithography and LIGA-type techniques to create high aspect-ratio lens structures for different optical geometries. Planar X-ray refractive lenses were manufactured in 1 mm thick SU-8 negative resist layer by means of deep synchrotron radiation lithography. The focusing properties of lenses were studied at ID18F and BM5 beamlines at the ESRF using monochromatic radiation in the energy range of 10 - 25 keV. By optimizing lens layout, mask making and resist processing, lenses of good quality were fabricated. The resolution of about 270 nm (FWHM) with gain in the order of 300 was measured at 14 keV. In-line holography of B-fiber was realized in imaging and projection mode with a magnification of 3 and 20, respectively. Submicron features of the fiber were clearly resolved. A radiation stability test proved that the fabricated lenses don't change focusing characteristics after dose of absorbed X-ray radiation of about 2 MJ/cm3. The unique radiation stability along with the high effficiency of SU8 lenses opens wide range of their synchrotron radiation applications such as microfocusing elements, condensers and collimators.

EUV patterning using CAR or MOX photoresist at low dose exposure for sub 36nm pitch

Science.gov (United States)

Thibaut, Sophie; Raley, Angélique; Lazarrino, Frederic; Mao, Ming; De Simone, Danilo; Piumi, Daniele; Barla, Kathy; Ko, Akiteru; Metz, Andrew; Kumar, Kaushik; Biolsi, Peter

2018-04-01

The semiconductor industry has been pushing the limits of scalability by combining 193nm immersion lithography with multi-patterning techniques for several years. Those integrations have been declined in a wide variety of options to lower their cost but retain their inherent variability and process complexity. EUV lithography offers a much desired path that allows for direct print of line and space at 36nm pitch and below and effectively addresses issues like cycle time, intra-level overlay and mask count costs associated with multi-patterning. However it also brings its own sets of challenges. One of the major barrier to high volume manufacturing implementation has been hitting the 250W power exposure required for adequate throughput [1]. Enabling patterning using a lower dose resist could help move us closer to the HVM throughput targets assuming required performance for roughness and pattern transfer can be met. As plasma etching is known to reduce line edge roughness on 193nm lithography printed features [2], we investigate in this paper the level of roughness that can be achieved on EUV photoresist exposed at a lower dose through etch process optimization into a typical back end of line film stack. We will study 16nm lines printed at 32 and 34nm pitch. MOX and CAR photoresist performance will be compared. We will review step by step etch chemistry development to reach adequate selectivity and roughness reduction to successfully pattern the target layer.

Heterogeneous integration of thin film compound semiconductor lasers and SU8 waveguides on SiO2/Si

Science.gov (United States)

Palit, Sabarni; Kirch, Jeremy; Mawst, Luke; Kuech, Thomas; Jokerst, Nan Marie

2010-02-01

We present the heterogeneous integration of a 3.8 μm thick InGaAs/GaAs edge emitting laser that was metal-metal bonded to SiO2/Si and end-fire coupled into a 2.8 μm thick tapered SU8 polymer waveguide integrated on the same substrate. The system was driven in pulsed mode and the waveguide output was captured on an IR imaging array to characterize the mode. The waveguide output was also coupled into a multimode fiber, and into an optical head and spectrum analyzer, indicating lasing at ~997 nm and a threshold current density of 250 A/cm2.

8x8 and 10x10 Hyperspace Representations of SU(3) and 10-fold Point-Symmetry Group of Quasicrystals

Science.gov (United States)

Animalu, Alexander

2012-02-01

In order to further elucidate the unexpected 10-fold point-symmetry group structure of quasi-crystals for which the 2011 Nobel Prize in chemistry was awarded to Daniel Shechtman, we explore a correspondence principle between the number of (projective) geometric elements (points[vertices] + lines[edges] + planes[faces]) of primitive cells of periodic or quasi-periodic arrangement of hard or deformable spheres in 3-dimensional space of crystallography and elements of quantum field theory of particle physics [points ( particles, lines ( particles, planes ( currents] and hence construct 8x8 =64 = 28+36 = 26 + 38, and 10x10 =100= 64 + 36 = 74 + 26 hyperspace representations of the SU(3) symmetry of elementary particle physics and quasicrystals of condensed matter (solid state) physics respectively, As a result, we predict the Cabibbo-like angles in leptonic decay of hadrons in elementary-particle physics and the observed 10-fold symmetric diffraction pattern of quasi-crystals.

Polymer Compund Refractive Lenses for Hard X-ray Nanofocusing

OpenAIRE

Krywka, Christina; Last, Arndt; Marschall, Felix; Markus, Otto; Georgi, Sebastian; Mueller, Martin; Mohr, Jürgen

2016-01-01

Compound refractive lenses fabricated out of SU-8 negative photoresist have been used to generate a nanofocused, i.e. sub-μm sized X-ray focal spot at an X-ray nanodiffraction setup. X-ray microscopy and X-ray diffraction techniques have conceptually different demands on nanofocusing optical elements and so with the application of X-ray nanodiffraction in mind, this paper presents the results of an initial characterization of polymer lenses used as primary focusin...

Diffusion and solubility of Au implanted into the AZ1350 photoresist

International Nuclear Information System (INIS)

Soares, M.R.F.; Kaschny, J.R.A.; Santos, J.H.R. dos; Amaral, L.; Behar, M.; Fink, D.

2000-01-01

In the present paper we report diffusion and solubility results for Au into the photoresist AZ1350. Au was implanted into AZ1350 films at very low energy (E=20 keV) and fluences (PHI=10 12 and 5x10 12 Au/cm 2 ). In this way the radiation damage introduced by the implantation process was minimized and cluster formation was avoided. Annealing was performed in the 150-300 deg. C temperature range and the as implanted and thermal treated samples were analyzed using the Rutherford backscattering (RBS) technique. For the lowest implantation fluence the results have shown a regular atomic diffusion process characterized by an activation energy of E a =640 meV. Instead, for PHI=5x10 12 Au/cm 2 the diffusional mechanism has revealed the effects of the radiation damage. In addition solubility measurements indicate that the solubility limit at 250 deg. C is of the order 0.3 at.%

Simulation of a low frequency Z-axis SU-8 accelerometer in coventorware and MEMS+

KAUST Repository

Carreno, Armando Arpys Arevalo

2013-04-01

This paper presents the simulation of a z-axis SU-8 capacitive accelerometer. The study consists of a modal analysis of the modeled accelerometer, a study relating capacitance to acceleration, capacitance to deflection, an effective spring constant calculation, and a comparison of results achieved using CoventorWare® ANALYZER™ and MEMS+®. A fabricated energy harvester design from [1] was used for modeling and simulation in this study, with a four spring attachment of a 650μm×650μm; ×110μm proof mass of 4.542×10-8 kg. At rest, the spacing between electrodes is 4μm along the z-axis, and at 1.5g acceleration, there is 1.9μm spacing between electrodes, at which point pull in occurs for a 1V voltage. © 2013 IEEE.

Transmittance enhancement of sapphires with antireflective subwavelength grating patterned UV polymer surface structures by soft lithography.

Science.gov (United States)

Lee, Soo Hyun; Leem, Jung Woo; Yu, Jae Su

2013-12-02

We report the total and diffuse transmission enhancement of sapphires with the ultraviolet curable SU8 polymer surface structures consisting of conical subwavelength gratings (SWGs) at one- and both-side surfaces for different periods. The SWGs patterns on the silicon templates were transferred into the SU8 polymer film surface on sapphires by a simple and cost-effective soft lithography technique. For the fabricated samples, the surface morphologies, wetting behaviors, and optical characteristics were investigated. For theoretical optical analysis, a rigorous coupled-wave analysis method was used. At a period of 350 nm, the sample with SWGs on SU8 film/sapphire exhibited a hydrophobic surface and higher total transmittance compared to the bare sapphire over a wide wavelength of 450-1000 nm. As the period of SWGs was increased, the low total transmittance region of < 85% was shifted towards the longer wavelengths and became broader while the diffuse transmittance was increased (i.e., larger haze ratio). For the samples with SWGs at both-side surfaces, the total and diffuse transmittance spectra were further enhanced compared to the samples with SWGs at one-side surface. The theoretical optical calculation results showed a similar trend to the experimentally measured data.

Micro-structuring of thick NdFeB films using high-power plasma etching for magnetic MEMS application

International Nuclear Information System (INIS)

Jiang, Yonggang; Fujita, Takayuki; Higuchi, Kohei; Maenaka, Kazusuke; Masaoka, Shingo; Uehara, Minoru

2011-01-01

This paper describes the micro-patterning of thick NdFeB magnetic films using a high-power plasma etching method. The effects of RF bias power and gas composition on the selectivity and etching rate are experimentally studied. A maximum etching rate of 60 nm min −1 is achieved with an inductively coupled plasma power of 500 W and a RF bias power of 200 W. A maximum selectivity of 0.26 between hard baked AZP4903 photoresist and NdFeB magnetic films is achieved when volumetric Cl 2 concentration is 2.5%. NdFeB micro-magnets as thick as 4.2 µm are achieved by using AZP4903 photoresist. Magnetic film as thick as 10 µm can be patterned by using SU-8 photoresist with a thickness of 100 µm as the mask. The magnetic property of patterned microstructures is characterized using a vibrating sample magnetometer and the magnetic field distribution is measured using a Hall effect sensor IC. The characterization results indicate that the patterned magnetic microstructures have a high magnetic remanance of 1.0 T, which is comparable to that of the non-patterned NdFeB films.

Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning

KAUST Repository

Li, Li

2015-07-28

© 2015 American Chemical Society. Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol-gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their particle sizes show a dramatic increase from the initial 3-4 nm to submicron size after exposure, with no apparent inorganic content or thermal property change detected. XPS results showed that the mass percentage of the carboxylic group in the structure of nanoparticles decreased with increasing exposure duration. The particle coarsening sensitivities of those hybrid nanoparticles are consistent with their EUV performance. The current work provides an understanding for the development mechanism and future guidance for the design and processing of high performance resist materials for large-scale microelectronics device fabrication.

B8B8 interaction in the SU6 quark model and its applications to few-body systems

International Nuclear Information System (INIS)

Fujiwara, Y.; Miyagawa, K.; Kohno, M.; Suzuki, Y.; Nakamoto, C.

2004-01-01

The recent QCD-inspired spin-flavor SU 6 quark model for the baryon-baryon interaction, proposed by the Kyoto-Niigata group, is a unified model for the complete baryon octet (B 8 =N, Λ, Σ and Ξ), which has achieved very accurate description of the NN and YN interactions. These quark-model interactions are now applied to realistic calculations of few-body systems in a new three-cluster Faddeev formalism which uses the 2-cluster resonating-group method kernel explicitly. We review the essential features of the most recent models, fss2 and FSS, and their predictions to few-body systems in confrontation with the available experimental data. As the few-body systems, we discuss the three-nucleon bound states, 2αΛ system for Λ 9 Be, and 2Λα system for ΛΛ 6 He. (author)

Oxide Nanoparticle EUV (ONE) Photoresists: Current Understanding of the Unusual Patterning Mechanism

KAUST Repository

Jiang, Jing; Zhang, Ben; Yu, Mufei; Li, Li; Neisser, Mark; Sung Chun, Jun; Giannelis, Emmanuel P.; Ober, Christopher K.

2015-01-01

© 2015 SPST. In the past few years, industry has made significant progress to deliver a stable high power EUV scanner and a 100 W light source is now being tested on the manufacuring scale. The success of a high power EUV source demands a fast and high resolution EUV resist. However, chemcially amplied resists encounter unprecedented challenges beyond the 22 nm node due to resolution, roughness and sensitivity tradeoffs. Unless novel solutions for EUV resists are proposed and further optimzed, breakthroughs can hardly be achieved. Oxide nanoparticle EUV (ONE) resists stablized by organic ligands were originally proposed by Ober et al. Recently this work attracts more and more attention due to its extraordinanry EUV sensitivity. This new class of photoresist utilizes ligand cleavage with a ligand exchange mechanism to switch its solubilty for dual-tone patterning. Therefore, ligand selection of the nanoparticles is extremely important to its EUV performance.

Degradation effects ad Si-depth profiling in photoresists using ion beam analysis

International Nuclear Information System (INIS)

Ijzendoorn, L.J. van; Schellekens, J.P.W.

1989-01-01

The reaction of silicon-containing vapour with a photoresist layer, as used in dry developable lithographic processes, was studied with Rutherford backscattering spectrometry (RBS). Degradation of the polymer layer was observed, but the total amount of incorporated Si was found to be constant during the measurement. Si-depth profiles were found to be independent of dose and in agreement with profiles obtained with secondary ion mass spectrometry (SIMS). The detection of hydrogen by elastic recoil detection (ERD) was used to study the degradation in detail. The decrease in hydrogen countrate from a layer of polystyrene on Si in combination with the shift of the Si-substrate edge in the corresponding RBS spectra was used for a model description. Only one degradation cross-section for hydrogen and one for carbon, both independent of beam current and dose, were required for a successful fit of the experimental data. (orig.)

SU(3) chiral symmetry for baryons

International Nuclear Information System (INIS)

Dmitrasinovic, V.

2011-01-01

Three-quark nucleon interpolating fields in QCD have well-defined SU L (3)xSU R (3) and U A (1) chiral transformation properties, viz. [(6,3)+(3,6)], [(3,3-bar)+(3-bar,3)], [(8,1)+(1,8)] and their 'mirror' images. It has been shown (phenomenologically) in Ref. [2] that mixing of the [(6,3)+(3,6)] chiral multiplet with one ordinary ('naive') and one 'mirror' field belonging to the [(3,3-bar)+(3-bar,3)], [(8,1)+(1,8)] multiplets can be used to fit the values of the isovector (g A (3) ) and the flavor-singlet (isoscalar) axial coupling (g A (0) ) of the nucleon and then predict the axial F and D coefficients, or vice versa, in reasonable agreement with experiment. In an attempt to derive such mixing from an effective Lagrangian, we construct all SU L (3)xSU R (3) chirally invariant non-derivative one-meson-baryon interactions and then calculate the mixing angles in terms of baryons' masses. It turns out that there are (strong) selection rules: for example, there is only one non-derivative chirally symmetric interaction between J 1/2 fields belonging to the [(6,3)+(3,6)] and the [(3,3-bar)+(3-bar,3)] chiral multiplets, that is also U A (1) symmetric. We also study the chiral interactions of the [(3,3-bar)+(3-bar,3)] and [(8,1)+(1,8)] nucleon fields. Again, there are selection rules that allow only one off-diagonal non-derivative chiral SU L (3)xSU R (3) interaction of this type, that also explicitly breaks the U A (1) symmetry. We use this interaction to calculate the corresponding mixing angles in terms of baryon masses and fit two lowest lying observed nucleon (resonance) masses, thus predicting the third (J = 1/2, I = 3/2)Δ resonance, as well as one or two flavor-singlet Λ hyperon(s), depending on the type of mixing. The effective chiral Lagrangians derived here may be applied to high density matter calculations.

Thin film free-standing PEDOT:PSS/SU8 bilayer microactuators

International Nuclear Information System (INIS)

Taccola, S; Greco, F; Mazzolai, B; Mattoli, V; Jager, E W H

2013-01-01

Several smart active materials have been proposed and tested for the development of microactuators. Among these, conjugated polymers are of great interest because miniaturization improves their electrochemical properties, such as increasing the speed and stress output of microactuators, with respect to large-scale actuators. Recently we developed a novel fabrication process to obtain robust free-standing conductive ultra-thin films made of the conjugated polymer poly(3, 4-ethylenedioxythiophene) doped with the polyanion poly(styrenesulfonate) (PEDOT:PSS). These conductive free-standing nanofilms, with thicknesses ranging between a few tens to several hundreds of nm, allow the realisation of new all polymer microactuators using facile microfabrication methods. Here, we report a novel processing method for manufacturing all polymer electrochemical microactuators. We fabricated and patterned free-standing PEDOT:PSS/SU8 bilayer microactuators in the form of microfingers of a variety of lengths using adapted microfabrication procedures. By imposing electrochemical oxidation/reduction cycles on the PEDOT:PSS we were able to demonstrate reversible actuation of the microactuators resulting in bending of the microfingers. A number of possible applications can be envisaged for these small, soft actuators, such as microrobotics and cell manipulation. (technical note)

Microring resonator based modulator made by direct photodefinition of an electro-optic polymer

Science.gov (United States)

Balakrishnan, M.; Faccini, M.; Diemeer, M. B. J.; Klein, E. J.; Sengo, G.; Driessen, A.; Verboom, W.; Reinhoudt, D. N.

2008-04-01

A laterally coupled microring resonator was fabricated by direct photodefinition of negative photoresist SU8, containing tricyanovinylidenediphenylaminobenzene chromophore, by exploiting the low ultraviolet absorption window of this chromophore. The ring resonator was first photodefined by slight cross-linking. Thereafter, poling (to align the chromophores) and further cross-linking (to increase the glass transition temperature) were simultaneously carried out. The material showed excellent photostability and the electro-optic modulation with an r33 of 11pm/V was demonstrated at 10MHz.

Coleman-Weinberg symmetry breaking in SU(8) induced by a third rank antisymmetric tensor scalar field II: the fermion spectrum

Science.gov (United States)

Adler, Stephen L.

2017-07-01

We continue our study of Coleman-Weinberg symmetry breaking induced by a third rank antisymmetric tensor scalar, in the context of the SU(8) model (Adler 2014 Int. J. Mod. Phys. A 29 1450130) we proposed earlier. We focus in this paper on qualitative features that will determine whether the model can make contact with the observed particle spectrum. We discuss the mechanism for giving the spin \\frac{3}{2} field a mass by the BEH mechanism, and analyze the remaining massless spin \\frac{1}{2} fermions, the global chiral symmetries, and the running couplings after symmetry breaking. We note that the smallest gluon mass matrix eigenvalue has an eigenvector suggestive of U(1) B-L , and conjecture that the theory runs to an infrared fixed point at which there is a massless gluon with 3 to  -1 ratios in generator components. Assuming this, we discuss a mechanism for making contact with the standard model, based on a conjectured asymmetric breaking of Sp(4) to SU(2) subgroups, one of which is the electroweak SU(2), and the other of which is a ‘technicolor’ group that binds the original SU(8) model fermions, which play the role of ‘preons’, into composites. Quarks can emerge as 5 preon composites and leptons as 3 preon composites, with consequent stability of the proton against decay to a single lepton plus a meson. A composite Higgs boson can emerge as a two preon composite. Since anomaly matching for the relevant conserved global symmetry current is not obeyed by three fermion families, emergence of three composite families requires formation of a Goldstone boson with quantum numbers matching this current, which can be a light dark matter candidate.

8D oscillator as a hidden SU(2)-monopole

International Nuclear Information System (INIS)

Mardoyan, L.G.; Sisakyan, A.N.; Ter-Antonyan, V.M.

1998-01-01

In the framework of an analytical approach and with the help of the generalized version of the Hurwitz transformation the five-dimensional SU(2)-monopole model is constructed from the eight-dimensional quantum oscillator. The Clebsch-Gordan expansion stimulated by the space-gauge coupling, the hyperangle and the radial parts of the total wave function, the energy spectrum of the charge-monopole bound system and the corresponding degeneracy are calculated

Study of functional viability of SU-8-based microneedles for neural applications

International Nuclear Information System (INIS)

Fernández, Luis J; Altuna, Ane; Tijero, Maria; Vilares, Roman; Berganzo, Javier; Blanco, F J; Gabriel, Gemma; Villa, Rosa; Rodríguez, Manuel J; Batlle, Montse

2009-01-01

This paper presents the design, fabrication, packaging and first test results of SU-8-based microneedles for neural applications. By the use of photolithography, sputtering and bonding techniques, polymer needles with integrated microchannels and electrodes have been successfully fabricated. The use of photolithography for the patterning of the fluidic channel integrated in the needle allows the design of multiple outlet ports at the needle tip, minimizing the possibility of being blocked by the tissue. Furthermore, the flexibility of the polymer reduces the risk of fracture and tissue damage once the needle is inserted, while it is still rigid enough to allow a perfect insertion into the neural tissue. Fluidic and electric characterization of the microneedles has shown their viability for drug delivery and monitoring in neural applications. First drug delivery tests in ex vivo tissue demonstrated the functional viability of the needle to deliver drugs to precise points. Furthermore, in vivo experiments have demonstrated lower associated damages during insertion than those by stereotaxic standard needles

Bi-directional triplexer with butterfly MMI coupler using SU-8 polymer waveguides

Science.gov (United States)

Mareš, David; Jeřábek, Vítězslav; Prajzler, Václav

2015-01-01

We report about a design of a bi-directional planar optical multiplex/demultiplex filter (triplexer) for the optical part of planar hybrid WDM bi-directional transceiver in fiber-to-the-home (FTTH) PON applications. The triplex lightwave circuit is based on the Epoxy Novolak Resin SU-8 waveguides on the silica-on-silicon substrate with Polymethylmethacrylate cladding layer. The triplexer is comprised of a linear butterfly concept of multimode interference (MMI) coupler separating downstream optical signals of 1490 nm and 1550 nm. For the upstream channel of 1310 nm, an additional directional coupler (DC) is used to add optical signal of 1310 nm propagating in opposite direction. The optical triplexer was designed and optimized using beam propagation method. The insertion losses, crosstalk attenuation, and extinction ratio for all three inputs/outputs were investigated. The intended triplexer was designed using the parameters of the separated DC and MMI filter to approximate the idealized direct connection of both devices.

Surface-adaptable all-metal micro-four-point probe with unique configuration

Science.gov (United States)

Kim, J. K.; Choi, Y. S.; Lee, D. W.

2015-07-01

In this paper, we propose a surface-adaptable all-metal micro-four-point probe (μ4PP) with a unique configuration. The μ4PP consists of four independent metallic sub-cantilevers with sharp Cu tips, and an SU-8 body structure to support the sub-cantilevers. The tip height is approximately 15 μm, and the tips are fabricated by anisotropic wet-etching of silicon followed by Cu electroplating. Each metallic cantilever connected to the SU-8 body structure acts as a flexible spring, so that the conducting tip can make gentle, non-destructive contact with fragile surfaces. To enhance the adhesion between the metallic sub-cantilevers and the SU-8 body, mushroom-shaped Cu structures were fabricated using an under-baked and under-exposed photolithography process. Various μ4PPs were designed and fabricated to verify their diverse range of applications, and preliminary experiments were performed using these fabricated μ4PPs. The resultant flexibility and reliability were experimentally confirmed on several samples, such as a polymer cantilever, a graphene flake, and curved metallic surfaces. We also expect that the proposed μ4PP will be suitable for measuring the anisotropic characteristics of crystal materials or the Hall effect in semiconductors.

Single Mode SU8 Polymer Based Mach-Zehnder Interferometer for Bio-Sensing Application

Science.gov (United States)

Boiragi, Indrajit; Kundu, Sushanta; Makkar, Roshan; Chalapathi, Krishnamurthy

2011-10-01

This paper explains the influence of different parameters to the sensitivity of an optical waveguide Mach-Zehnder Interferometer (MZI) for real time detection of biomolecules. The sensing principle is based on the interaction of evanescence field with the biomolecules that get immobilized on sensing arm. The sensitivity has been calculated by varying the sensing window length, wavelength and concentration of bio-analyte. The maximum attainable sensitivity for the preferred design is the order of 10-8 RIU at 840 nm wavelength with a sensing window length of 1cm. All the simulation work has been carried out with Opti-BPMCAD for the optimization of MZI device parameters. The SU8 polymers are used as a core and clad material to fabricate the waveguide. The refractive index of cladding layer is optimized by varying the curing temperature for a fixed time period and the achieved index difference between core and clad is Δn = 0.0151. The fabricated MZI device has been characterized with LASER beam profiler at 840 nm wavelength. This study demonstrates the effectiveness of the different parameter to the sensitivity of a single mode optical waveguide Mach-Zehnder Interferometer for bio-sensing application.

Single mode solid state distributed feedback dye laser fabricated by grey scale electron beam lithography on dye doped SU-8 resist

DEFF Research Database (Denmark)

Balslev, Søren; Rasmussen, Torben; Shi, Peixiong

2005-01-01

We demonstrate grey scale electron beam lithography on functionalized SU-8 resist for fabrication of single mode solid state dye laser devices. The resist is doped with Rhodamine 6G perchlorate and the lasers are based on a first order Bragg grating distributed feedback resonator. The lasers...

Nonlinear numerical analysis and experimental testing for an electrothermal SU-8 microgripper with reduced out-of-plane displacement

Science.gov (United States)

Voicu, Rodica-Cristina; Zandi, Muaiyd Al; Müller, Raluca; Wang, Changhai

2017-11-01

This paper reports the results of numerical nonlinear electro-thermo-mechanical analysis and experimental testing of a polymeric microgripper designed using electrothermal actuators. The simulation work was carried out using a finite element method (FEM) and a commercial software (Coventorware 2014). The biocompatible SU-8 polymer was used as structural material for the fabrication of the microgripper. The metallic micro-heater was encapsulated in the polymeric actuation structures of the microgripper to reduce the undesirable out-of-plane displacement of the microgripper tips, and to electrically isolate the micro-heater, and to reduce the mechanical stress as well as to improve the thermal efficiency. The electro- thermo-mechanical analysis of the actuator considers the nonlinear temperature-dependent properties of the SU-8 polymer and the gold thin film layers used for the micro-heater fabrication. An optical characterisation of the microgripper based on an image tracking approach shows the thermal response and the good repeatability. The average deflection is ~11 µm for an actuation current of ~17 mA. The experimentally obtained tip deflection and the heater temperature at different currents are both shown to be in good agreement with the nonlinear electro-thermo-mechanical simulation results. Finally, we demonstrate the capability of the microgripper by capture and manipulation of cotton fibres.

Analysis of single-cell differences by use of an on-chip microculture system and optical trapping.

Science.gov (United States)

Wakamoto, Y; Inoue, I; Moriguchi, H; Yasuda, K

2001-09-01

A method is described for continuous observation of isolated single cells that enables genetically identical cells to be compared; it uses an on-chip microculture system and optical tweezers. Photolithography is used to construct microchambers with 5-microm-high walls made of thick photoresist (SU-8) on the surface of a glass slide. These microchambers are connected by a channel through which cells are transported, by means of optical tweezers, from a cultivation microchamber to an analysis microchamber, or from the analysis microchamber to a waste microchamber. The microchambers are covered with a semi-permeable membrane to separate them from nutrient medium circulating through a "cover chamber" above. Differential analysis of isolated direct descendants of single cells showed that this system could be used to compare genetically identical cells under contamination-free conditions. It should thus help in the clarification of heterogeneous phenomena, for example unequal cell division and cell differentiation.

d=8 supergravity

International Nuclear Information System (INIS)

Salam, A.; Sezgin, E.

1984-10-01

SU(2) gauged N=2 supergravity in d=8 is constructed by generalized dimensional reduction of d=11 supergravity on SU(2) group manifold. The relation between the field equations of the d=8 and those of d=11 supergravities is established. As a byproduct of this, it is shown that certain compactifications of d=11 supergravity give rise to anti-de Sitter space-time (AdS)xS 4 or AdSxCP 2 (with or without SU(2) instanton) or AdSxS 2 xS 2 compactifications of d=8 supergravity. The latter two solutions have no supersymmetry, while AdSxS 4 has N=0 or N=1 supersymmetry. (author)

Mask fabrication process

Science.gov (United States)

Cardinale, Gregory F.

2000-01-01

A method for fabricating masks and reticles useful for projection lithography systems. An absorber layer is conventionally patterned using a pattern and etch process. Following the step of patterning, the entire surface of the remaining top patterning photoresist layer as well as that portion of an underlying protective photoresist layer where absorber material has been etched away is exposed to UV radiation. The UV-exposed regions of the protective photoresist layer and the top patterning photoresist layer are then removed by solution development, thereby eliminating the need for an oxygen plasma etch and strip and chances for damaging the surface of the substrate or coatings.

Rapid 3D µ-printing of polymer optical whispering-gallery mode resonators.

Science.gov (United States)

Wu, Jushuai; Guo, Xin; Zhang, A Ping; Tam, Hwa-Yaw

2015-11-16

A novel microfabrication method for rapid printing of polymer optical whispering-gallery mode (WGM) resonators is presented. A 3D micro-printing technology based on high-speed optical spatial modulator (SLM) and high-power UV light source is developed to fabricate suspended-disk WGM resonator array using SU-8 photoresist. The optical spectral responses of the fabricated polymer WGM resonators were measured with a biconically tapered optical fiber. Experimental results reveal that the demonstrated method is very flexible and time-saving for rapid fabrication of complex polymer WGM resonators.

Microchip Flow Cytometer with Integrated Polymer Optical Elements for Measurement of Scattered Light

DEFF Research Database (Denmark)

Wang, Zhenyu; El-Ali, Jamil; Perch-Nielsen, Ivan Ryberg

2004-01-01

channels to form a complete microchip flow cytometer. All the optical elements, the microfluidic system, and the fiber-to-waveguide couplers were defined in one layer of polymer (SU-8, negative photoresist) by standard photolithography. With only one single mask procedure, all the fabrication and packaging...... processes can be finished in one day. Polystyrene beads were measured in the microchip flow cytometer, and three signals (forward scattering, large angle scattering and extinction) were measured simultaneously for each bead. The average intensities of the forward Scattered light and the incident light...

Silicon Micromachined Microlens Array for THz Antennas

Science.gov (United States)

Lee, Choonsup; Chattopadhyay, Goutam; Mehdi, IImran; Gill, John J.; Jung-Kubiak, Cecile D.; Llombart, Nuria

2013-01-01

5 5 silicon microlens array was developed using a silicon micromachining technique for a silicon-based THz antenna array. The feature of the silicon micromachining technique enables one to microfabricate an unlimited number of microlens arrays at one time with good uniformity on a silicon wafer. This technique will resolve one of the key issues in building a THz camera, which is to integrate antennas in a detector array. The conventional approach of building single-pixel receivers and stacking them to form a multi-pixel receiver is not suited at THz because a single-pixel receiver already has difficulty fitting into mass, volume, and power budgets, especially in space applications. In this proposed technique, one has controllability on both diameter and curvature of a silicon microlens. First of all, the diameter of microlens depends on how thick photoresist one could coat and pattern. So far, the diameter of a 6- mm photoresist microlens with 400 m in height has been successfully microfabricated. Based on current researchers experiences, a diameter larger than 1-cm photoresist microlens array would be feasible. In order to control the curvature of the microlens, the following process variables could be used: 1. Amount of photoresist: It determines the curvature of the photoresist microlens. Since the photoresist lens is transferred onto the silicon substrate, it will directly control the curvature of the silicon microlens. 2. Etching selectivity between photoresist and silicon: The photoresist microlens is formed by thermal reflow. In order to transfer the exact photoresist curvature onto silicon, there needs to be etching selectivity of 1:1 between silicon and photoresist. However, by varying the etching selectivity, one could control the curvature of the silicon microlens. The figure shows the microfabricated silicon microlens 5 x5 array. The diameter of the microlens located in the center is about 2.5 mm. The measured 3-D profile of the microlens surface has a

Intersecting Branes Flip SU(5)

CERN Document Server

Ellis, Jonathan Richard; Nanopoulos, Dimitri V; Ellis, John

2002-01-01

Within a toroidal orbifold framework, we exhibit intersecting brane-world constructions of flipped SU(5) \\times U(1) GUT models with various numbers of generations, other chiral matter representations and Higgs representations. We exhibit orientifold constructions with integer winding numbers that yield 8 or more conventional SU(5) generations, and orbifold constructions with fractional winding numbers that yield flipped SU(5) \\times U(1) models with just 3 conventional generations. Some of these models have candidates for the 5 and {\\bar 5} Higgs representations needed for electroweak symmetry breaking, but not for the 10 and {\\bar 10} representations needed for GUT symmetry breaking, or vice-versa.

3-dimensional free standing micro-structures by proton beam writing of Su 8-silver nanoParticle polymeric composite

Science.gov (United States)

Igbenehi, H.; Jiguet, S.

2012-09-01

Proton beam lithography a maskless direct-write lithographic technique (well suited for producing 3-Dimensional microstructures in a range of resist and semiconductor materials) is demonstrated as an effective tool in the creation of electrically conductive freestanding micro-structures in an Su 8 + Nano Silver polymer composite. The structures produced show non-ohmic conductivity and fit the percolation theory conduction model of tunneling of separated nanoparticles. Measurements show threshold switching and a change in conductivity of at least 4 orders of magnitude. The predictable range of protons in materials at a given energy is exploited in the creation of high aspect ratio, free standing micro-structures, made from a commercially available SU8 Silver nano-composite (GMC3060 form Gersteltec Inc. a negative tone photo-epoxy with added metallic nano-particles(Silver)) to create films with enhanced electrical properties when exposed and cured. Nano-composite films are directly written on with a finely focused MeV accelerated Proton particle beam. The energy loss of the incident proton beams in the target polymer nano- composite film is concentrated at the end of its range, where damage occurs; changing the chemistry of the nano-composite film via an acid initiated polymerization - creating conduction paths. Changing the energy of the incident beams provide exposed regions with different penetration and damage depth - exploited in the demonstrated cantilever microstructure.

Low leaching and low LWR photoresist development for 193 nm immersion lithography

Science.gov (United States)

Ando, Nobuo; Lee, Youngjoon; Miyagawa, Takayuki; Edamatsu, Kunishige; Takemoto, Ichiki; Yamamoto, Satoshi; Tsuchida, Yoshinobu; Yamamoto, Keiko; Konishi, Shinji; Nakano, Katsushi; Tomoharu, Fujiwara

2006-03-01

With no apparent showstopper in sight, the adoption of ArF immersion technology into device mass production is not a matter of 'if' but a matter of 'when'. As the technology matures at an unprecedented speed, many of initial technical difficulties have been cleared away and the use of a protective layer known as top coat, initially regarded as a must, now becomes optional, for example. Our focus of interest has also sifted to more practical and production related issues such as defect reducing and performance enhancement. Two major types of immersion specific defects, bubbles and a large number of microbridges, were observed and reported elsewhere. The bubble defects seem to decrease by improvement of exposure tool. But the other type defect - probably from residual water spots - is still a problem. We suspect that the acid leaching from resist film causes microbridges. When small water spots were remained on resist surface after exposure, acid catalyst in resist film is leaching into the water spots even though at room temperature. After water from the spot is dried up, acid molecules are condensed at resist film surface. As a result, in the bulk of resist film, acid depletion region is generated underneath the water spot. Acid catalyzed deprotection reaction is not completed at this acid shortage region later in the PEB process resulting in microbridge type defect formation. Similar mechanism was suggested by Kanna et al, they suggested the water evaporation on PEB plate. This hypothesis led us to focus on reducing acid leaching to decrease residual water spot-related defect. This paper reports our leaching measurement results and low leaching photoresist materials satisfying the current leaching requirements outlined by tool makers without topcoat layer. On the other hand, Nakano et al reported that the higher receding contact angle reduced defectivity. The higher receding contact angle is also a key item to increase scan speed. The effort to increase the

Aqueous-based thick photoresist removal for bumping applications

Science.gov (United States)

Moore, John C.; Brewer, Alex J.; Law, Alman; Pettit, Jared M.

2015-03-01

Cleaning processes account for over 25% of processing in microelectronic manufacturing [1], suggesting electronics to be one of the most chemical intensive markets in commerce. Industry roadmaps exist to reduce chemical exposure, usage, and waste [2]. Companies are encouraged to create a safer working environment, or green factory, and ultimately become certified similar to LEED in the building industry [3]. A significant step in this direction is the integration of aqueous-based photoresist (PR) strippers which eliminate regulatory risks and cut costs by over 50%. One of the largest organic solvent usages is based upon thick PR removal during bumping processes [4-6]. Using market projections and the benefits of recycling, it is estimated that over 1,000 metric tons (mt) of residuals originating from bumping processes are incinerated or sent to a landfill. Aqueous-based stripping would eliminate this disposal while also reducing the daily risks to workers and added permitting costs. Positive-tone PR dissolves in aqueous strippers while negative-tone systems are lifted-off from the substrate, bumps, pillars, and redistribution layers (RDL). While the wafers are further processed and rinsed, the lifted-off PR is pumped from the tank, collected onto a filter, and periodically back-flushed to the trash. The PR solids become a non-hazardous plastic waste while the liquids are mixed with the developer stream, neutralized, filtered, and in most cases, disposed to the sewer. Regardless of PR thickness, removal processes may be tuned to perform in <15min, performing at rates nearly 10X faster than solvents with higher bath lives. A balanced formula is safe for metals, dielectrics, and may be customized to any fab.

Nonperturbative flipped SU(5) vacua in heterotic M-theory

Energy Technology Data Exchange (ETDEWEB)

Faraggi, Alon E. E-mail: faraggi@thphys.ox.ac.uk; Garavuso, Richard E-mail: garavuso@thphys.ox.ac.uk; Isidro, Jose M. E-mail: isidro@thphys.ox.ac.uk

2002-10-07

The evidence for neutrino masses in atmospheric and solar neutrino experiments provides further support for the embedding of the Standard Model fermions in the chiral 16 SO(10) representation. Such an embedding is afforded by the realistic free fermionic heterotic-string models. In this paper we advance the study of these string models toward a nonperturbative analysis by generalizing the work of Donagi, Pantev, Ovrut and Waldram from the case of G=SU(2n+1) to G=SU(2n) stable holomorphic vector bundles on elliptically fibered Calabi-Yau manifolds with fundamental group Z{sub 2}. We demonstrate existence of G=SU(4) solutions with three generations and SO(10) observable gauge group over Hirzebruch base surface, whereas we show that certain classes of del Pezzo base surface do not admit such solutions. The SO(10) symmetry is broken to SU(5)xU(1) by a Wilson line. The overlap with the realistic free fermionic heterotic-string models is discussed.

Ion implantation in semiconductor bodies

International Nuclear Information System (INIS)

Badawi, M.H.

1984-01-01

Ions are selectively implanted into layers of a semiconductor substrate of, for example, semi-insulating gallium arsenide via a photoresist implantation mask and a metallic layer of, for example, titanium disposed between the substrate surface and the photoresist mask. After implantation the mask and metallic layer are removed and the substrate heat treated for annealing purposes. The metallic layer acts as a buffer layer and prevents possible contamination of the substrate surface, by photoresist residues, at the annealing stage. Such contamination would adversely affect the electrical properties of the substrate surface, particularly gallium arsenide substrates. (author)

Laws of trigonometry on SU(3)

International Nuclear Information System (INIS)

Aslaksen, H.

1988-01-01

In this paper we will study triangles in SU(3). The orbit space of congruence classes of triangles in SU(3) has dimension 8. Each corner is made up of a pair of tangent vectors (X,Y), and we consider the 8 functions trX 2 , i trX 3 , trY 2 , i trY 3 , trXY, i trY 2 Y, i trXY 2 , trX 2 Y 2 which are invariant under the full isometry group of SU(3). We show that these 8 corner invariants determine the isometry class of the triangle. We give relations (laws of trigonometry) between the invariants at the different corners, enabling us to determine the invariants at the remaining corners, including the values of the remaining side and angles, if we know one set of corner invariants. The invariants that only depend on one tangent vector we will call side invariants, while those that depend on two tangent vectors will be called angular invariants. For each triangle we then have 6 side invariants and 12 angular invariants. Hence we need 18 - 8 = 10 laws of trigonometry. The basic tool for deriving these laws is a formula expressing tr(exp X exp Y) in terms of the corner invariants

Microfabrication on a curved surface using 3D microlens array projection

International Nuclear Information System (INIS)

Li, Lei; Yi, Allen Y

2009-01-01

Accurate three-dimensional microstructures on silicon or other substrates are becoming increasingly important for optical, electronic, biomedical and medical applications. Traditional microfabrication processes based on cleanroom lithography and dry or wet etching processes are essentially two-dimensional methods. In the past, complicated procedures were designed to create some three-dimensional microstructures; however, these processes were mainly used to create features on planar silicon wafer substrates using the bulk silicon machining technique. In a major departure from previous micromachining processes, a microfabrication process based on microlens projection is presented in this paper. The proposed microfabrication system will have the capabilities of a typical conventional micromachining process plus the unique true three-dimensional replication features based on microlenses that were created on a steep curved substrate. These microlenses were precisely fabricated with a specific pattern on the curved surface that can be used to create microstructures on a pre-defined nonplanar substrate where a layer of photoresist was spin coated. After proper exposure and development, the desired micro patterns are created on the photoresist layer. These micro features can eventually be replicated on the substrate via wet or dry etching processes. The results show that the fabricated three-dimensional microlens array has very high dimensional accuracy and the profile error is less than 6 µm over the entire surface

A packaged, low-cost, robust optical fiber strain sensor based on small cladding fiber sandwiched within periodic polymer grating.

Science.gov (United States)

Chiang, Chia-Chin; Li, Chein-Hsing

2014-06-02

In the present study, a novel packaged long-period fiber grating (PLPFG) strain sensor is first presented. The MEMS process was utilized to fabricate the packaged optical fiber strain sensor. The sensor structure consisted of etched optical fiber sandwiched between two layers of thick photoresist SU-8 3050 and then packaged with poly (dimethylsiloxane) (PDMS) polymer material to construct the PLPFG strain sensor. The PDMS packaging material was used to prevent the glue effect, wherein glue flows into the LPFG structure and reduces coupling strength, in the surface bonding process. Because the fiber grating was packaged with PDMS material, it was effectively protected and made robust. The resonance attenuation dip of PLPFG grows when it is loading. This study explored the size effect of the grating period and fiber diameter of PLPFG via tensile testing. The experimental results found that the best strain sensitivity of the PLPFG strain sensor was -0.0342 dB/με, and that an R2 value of 0.963 was reached.

Microchannel-connected SU-8 honeycombs by single-step projection photolithography for positioning cells on silicon oxide nanopillar arrays

International Nuclear Information System (INIS)

Larramendy, Florian; Paul, Oliver; Blatche, Marie Charline; Mazenq, Laurent; Laborde, Adrian; Temple-Boyer, Pierre

2015-01-01

We report on the fabrication, functionalization and testing of SU-8 microstructures for cell culture and positioning over large areas. The microstructure consists of a honeycomb arrangement of cell containers interconnected by microchannels and centered on nanopillar arrays designed for promoting cell positioning. The containers have been dimensioned to trap single cells and, with a height of 50 µm, prevent cells from escaping. The structures are fabricated using a single ultraviolet photolithography exposure with focus depth in the lower part of the SU-8 resist. With optimized process parameters, microchannels of various aspect ratios are thus produced. The cell containers and microchannels serve for the organization of axonal growth between neurons. The roughly 2 µm-high and 500 nm-wide nanopillars are made of silicon oxide structured by deep reactive ion etching. In future work, beyond their cell positioning purpose, the nanopillars could be functionalized as sensors. The proof of concept of the novel microstructure for organized cell culture is given by the successful growth of interconnected PC12 cells. Promoted by the honeycomb geometry, a dense network of interconnections between the cells has formed and the intended intimate contact of cells with the nanopillar arrays was observed by scanning electron microscopy. This proves the potential of these new devices as tools for the controlled cell growth in an interconnected container system with well-defined 3D geometry. (paper)

Pyrolytic 3D Carbon Microelectrodes for Electrochemistry

DEFF Research Database (Denmark)

Hemanth, Suhith; Caviglia, Claudia; Amato, Letizia

2016-01-01

This work presents the fabrication and characterization of suspended three-dimensional (3D) pyrolytic carbon microelectrodes for electrochemical applications. For this purpose, an optimized process with multiple steps of UV photolithography with the negative tone photoresist SU-8 followed...... by pyrolysis at 900ºC for 1h was developed. With this process, microelectrode chips with a three electrode configuration were fabricated and characterized with cyclic voltammetry (CV) using a 10mM potassium ferri-ferrocyanide redox probe in a custom made batch system with magnetic clamping. The 3D pyrolytic...... carbon microelectrodes displayed twice the higher peak current compared to 2D....

Integrated polymer waveguides for absorbance detection in chemical analysis systems

DEFF Research Database (Denmark)

Mogensen, Klaus Bo; El-Ali, Jamil; Wolff, Anders

2003-01-01

A chemical analysis system for absorbance detection with integrated polymer waveguides is reported for the first time. The fabrication procedure relies on structuring of a single layer of the photoresist SU-8, so both the microfluidic channel network and the optical components, which include planar....... The emphasis of this paper is on the signal-to-noise ratio of the detection and its relation to the sensitivity. Two absorbance cells with an optical path length of 100 μm and 1000 μm were characterized and compared in terms of sensitivity, limit of detection and effective path length for measurements...

Fabrication of ten-fold photonic quasicrystalline structures

Directory of Open Access Journals (Sweden)

XiaoHong Sun

2015-05-01

Full Text Available Compared to periodic crystals, quasicrystals have higher point group symmetry and are more favorable in achieving complete band-gaps. In this report, a top-cut prism interferometer is designed to fabricate ten-fold photonic quasicrystalline structures. By optimizing the exposing conditions and material characteristics, appropriate quasicrystals have been obtained in the SU8 photoresist films. Atomic Force Microscopy and laser diffraction are used to characterize the fabricated structures. The measurement results show the consistence between the theoretical design and experiments. This will provide guidance for the large-area and fast production of ten-fold quasicrystalline structures with high quality.

Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures

Energy Technology Data Exchange (ETDEWEB)

Park, Sungmin; Nam, Gyungmok; Kim, Jonghun; Yoon, Sang-Hee [Inha Univ, Incheon (Korea, Republic of)

2016-08-15

Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.

Ink-jet printing technology enables self-aligned mould patterning for electroplating in a single step

International Nuclear Information System (INIS)

Meissner, M V; Spengler, N; Mager, D; Wang, N; Kiss, S Z; Höfflin, J; While, P T; Korvink, J G

2015-01-01

We present a new self-aligned, mask-free micro-fabrication method with which to form thick-layered conductive metal micro-structures inside electroplating moulds. Seed layer patterning for electroplating was performed by ink-jet printing using a silver nano-particle ink deposited on SU-8 or Ordyl SY permanent resist. The silver ink contact angle on SU-8 was adjusted by oxygen plasma followed by a hard bake. Besides functioning as a seed layer, the printed structures further served as a shadow mask during patterning of electroplating moulds into negative photoresist. The printed silver tracks remained in strong adhesion to the substrate when exposed to the acidic chemistry of the electroplating bath. To demonstrate the process, we manufactured rectangular, low-resistivity planar micro-coils for use in magnetic resonance microscopy. MRI images of a spring onion with an in-plane resolution down to 10 µm × 10 µm were acquired using a micro-coil on an 11.7 T MRI scanner. (paper)

Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures

International Nuclear Information System (INIS)

Park, Sungmin; Nam, Gyungmok; Kim, Jonghun; Yoon, Sang-Hee

2016-01-01

Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed

Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width

Science.gov (United States)

Mohammed, Mohammed Ziauddin; Mourad, Abdel-Hamid I.; Khashan, Saud A.

2018-06-01

The application of maskless lithography technique on negative photoresist material is investigated in this study. The equipment used in this work is designed and built especially for maskless lithography applications. The UV laser of 405 nm wavelength with 0.85 Numerical Aperture is selected for direct laser writing. All the samples are prepared on a glass substrate. Samples are tested at different UV laser intensities and different stage velocities in order to study the impact on patterned line width. Three cases of spin coated layers of thickness 90 μm, 40 μm, and 28 μm on the substrate are studied. The experimental results show that line width has a generally increasing trend with intensity. However, a decreasing trend was observed for increasing velocity. The overall performance shows that the mr-DWL material is suitable for direct laser writing systems.

Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width

Science.gov (United States)

Mohammed, Mohammed Ziauddin; Mourad, Abdel-Hamid I.; Khashan, Saud A.

2018-04-01

The application of maskless lithography technique on negative photoresist material is investigated in this study. The equipment used in this work is designed and built especially for maskless lithography applications. The UV laser of 405 nm wavelength with 0.85 Numerical Aperture is selected for direct laser writing. All the samples are prepared on a glass substrate. Samples are tested at different UV laser intensities and different stage velocities in order to study the impact on patterned line width. Three cases of spin coated layers of thickness 90 μm, 40 μm, and 28 μm on the substrate are studied. The experimental results show that line width has a generally increasing trend with intensity. However, a decreasing trend was observed for increasing velocity. The overall performance shows that the mr-DWL material is suitable for direct laser writing systems.

Dimensional Reduction of N=1, E_8 SYM over SU(3)/U(1) x U(1) x Z_3 and its four-dimensional effective action

CERN Document Server

Irges, Nikos; Zoupanos, George

2011-01-01

We present an extension of the Standard Model inspired by the E_8 x E_8 Heterotic String. In order that a reasonable effective Lagrangian is presented we neglect everything else other than the ten-dimensional N=1 supersymmetric Yang-Mills sector associated with one of the gauge factors and certain couplings necessary for anomaly cancellation. We consider a compactified space-time M_4 x B_0 / Z_3, where B_0 is the nearly-Kaehler manifold SU(3)/U(1) x U(1) and Z_3 is a freely acting discrete group on B_0. Then we reduce dimensionally the E_8 on this manifold and we employ the Wilson flux mechanism leading in four dimensions to an SU(3)^3 gauge theory with the spectrum of a N=1 supersymmetric theory. We compute the effective four-dimensional Lagrangian and demonstrate that an extension of the Standard Model is obtained with interesting features including a conserved baryon number and fixed tree level Yukawa couplings and scalar potential. The spectrum contains new states such as right handed neutrinos and heavy ...

Light-absorbent liquid immersion angled exposure for patterning 3D samples with vertical sidewalls

International Nuclear Information System (INIS)

Kumagai, Shinya; Kubo, Hironori; Sasaki, Minoru

2017-01-01

To make photolithography patterns on 3D samples, the angled (inclined) exposure technique has been used so far. However, technological issues have emerged in making photolithography patterns on the surface of trench structures. The surface of the trench structures can be covered with a photoresist film by spray-coating but the photoresist film deposited on the sidewalls and bottom of the trench is generally thin. The thin photoresist film deposited inside the trench has been easily overdosed. Moreover, irregular patterns have frequently been formed by the light reflected inside the trench. In this study, we have developed liquid immersion photolithography using a light-absorbent material. The light-reflection inside the trench was suppressed. Various patterns were transferred in the photoresist film deposited on the trench structures which had an aspect ratio of 0.74. Compared to immersion photolithography using pure water under p -polarization light control, the light-absorbent liquid immersion photolithography developed here patterned well the surfaces of the trench sidewalls and bottom. (paper)

SuDS for managing surface water in Diepsloot informal settlement ...

African Journals Online (AJOL)

Sustainable drainage systems (SuDS) imitate natural water management processes in catchments that have been degraded due to urbanisation. The aim is to reduce the quantity of stormwater runoff and improve water quality. Management of rainwater in the informal settlement of Diepsloot in Johannesburg is ...

SU(4)

Indian Academy of Sciences (India)

Abstract. We introduce in this paper embedded Gaussian unitary ensemble of random matrices, for m fermions in Ω number of single particle orbits, generated by random two- body interactions that are SU(4) scalar, called EGUE(2)-SU(4). Here the SU(4) algebra corresponds to Wigner's supermultiplet SU(4) symmetry in ...

Quantitative diffusion and swelling kinetic measurements using large-angle interferometric refractometry.

Science.gov (United States)

Saunders, John E; Chen, Hao; Brauer, Chris; Clayton, McGregor; Chen, Weijian; Barnes, Jack A; Loock, Hans-Peter

2015-12-07

The uptake and release of sorbates into films and coatings is typically accompanied by changes of the films' refractive index and thickness. We provide a comprehensive model to calculate the concentration of the sorbate from the average refractive index and the film thickness, and validate the model experimentally. The mass fraction of the analyte partitioned into a film is described quantitatively by the Lorentz-Lorenz equation and the Clausius-Mosotti equation. To validate the model, the uptake kinetics of water and other solvents into SU-8 films (d = 40-45 μm) were explored. Large-angle interferometric refractometry measurements can be used to characterize films that are between 15 μm to 150 μm thick and, Fourier analysis, is used to determine independently the thickness, the average refractive index and the refractive index at the film-substrate interface at one-second time intervals. From these values the mass fraction of water in SU-8 was calculated. The kinetics were best described by two independent uptake processes having different rates. Each process followed one-dimensional Fickian diffusion kinetics with diffusion coefficients for water into SU-8 photoresist film of 5.67 × 10(-9) cm(2) s(-1) and 61.2 × 10(-9) cm(2) s(-1).

Fabrication and characterization of microcavity lasers in rhodamine B doped SU8 using high energy proton beam

Science.gov (United States)

Venugopal Rao, S.; Bettiol, A. A.; Vishnubhatla, K. C.; Bhaktha, S. N. B.; Narayana Rao, D.; Watt, F.

2007-03-01

The authors present their results on the characterization of individual dye-doped microcavity polymer lasers fabricated using a high energy proton beam. The lasers were fabricated in rhodamine B doped SU8 resist with a single exposure step followed by chemical processing. The resulting trapezoidal shaped cavities had dimensions of ˜250×250μm2. Physical characterization of these structures was performed using a scanning electron microscope while the optical characterization was carried out by recording the emission subsequent to pumping the lasers with 532nm, 6 nanosecond pulses. The authors observed intense, narrow emission near 624nm with the best emission linewidth full width at half maximum of ˜9nm and a threshold ˜150μJ/mm2.

Reappraisal of the sequence boundary in time and space: Case and considerations for an SU (subaerial unconformity) that is not a sediment bypass surface, a time barrier, or an unconformity

Science.gov (United States)

Holbrook, John M.; Bhattacharya, Janok P.

2012-07-01

The sequence-bounding unconformity bears the key defining traits of being "a surface separating younger from older strata, along which there is evidence of subaerial erosional truncation … or subaerial exposure, with a significant hiatus indicated (Van Wagoner et al., 1988)." This subaerial component of sequence boundaries (subaerial unconformity—SU) is also broadly considered to form as a topographic surface of sediment bypass, carved during relative sea level fall and buried by backfilling during relative sea level rise. Accordingly, the SU is commonly presumed to record an approximate time barrier, which separates older from younger strata along its full length. In this paper we show that regional composite scour (RCS) surfaces that are traditionally mapped as an integral component of the SU were never a single subaerial topographic surface characterized by sediment bypass, are not unconformities, do not record an effective time barrier, and form diachronously at the channel-belt scale over the entire fall to rise of a base-level cycle. These RCS surfaces, and by inference the SU surfaces they comprise, thus do not fully fit key defining characteristics embodied in the conceptual sequence boundary. Flume observations and field data show that the RCS is buried by fluvial sediment simultaneously as it is scoured. Accordingly, the RCS is perennially covered with stored sediment during formation, is only exposed as a subaerial topographic surface at the local place and time where it is undergoing active growth, and forms over the duration of local marine drainage during a relative sea-level cycle. This "cut-and-cover" model differs greatly from more established "bypass" models, which assume that the RCS was roughly sediment free and subaerially exposed for long durations of incision during regression and thus preserves a significant depositional hiatus upon later burial. Instead, the RCS may commonly and locally record a hiatus more typical of a facies

MEMS flexible artificial basilar membrane fabricated from piezoelectric aluminum nitride on an SU-8 substrate

International Nuclear Information System (INIS)

Jang, Jongmoon; Choi, Hongsoo; Jang, Jeong Hun

2017-01-01

In this paper, we present a flexible artificial basilar membrane (FABM) that mimics the passive mechanical frequency selectivity of the basilar membrane. The FABM is composed of a cantilever array made of piezoelectric aluminum nitride (AlN) on an SU-8 substrate. We analyzed the orientations of the AlN crystals using scanning electron microscopy and x-ray diffraction. The AIN crystals are oriented in the c -axis (0 0 2) plane and effective piezoelectric coefficient was measured as 3.52 pm V −1 . To characterize the frequency selectivity of the FABM, mechanical displacements were measured using a scanning laser Doppler vibrometer. When electrical and acoustic stimuli were applied, the measured resonance frequencies were in the ranges of 663.0–2369 Hz and 659.4–2375 Hz, respectively. These results demonstrate that the mechanical frequency selectivity of this piezoelectric FABM is close to the human communication frequency range (300–3000 Hz), which is a vital feature of potential auditory prostheses. (paper)

A novel C-shaped, gold nanoparticle coated, embedded polymer waveguide for localized surface plasmon resonance based detection.

Science.gov (United States)

Prabhakar, Amit; Mukherji, Soumyo

2010-12-21

In this study, a novel embedded optical waveguide based sensor which utilizes localized surface plasmon resonance of gold nanoparticles coated on a C-shaped polymer waveguide is being reported. The sensor, as designed, can be used as an analysis chip for detection of minor variations in the refractive index of its microenvironment, which makes it suitable for wide scale use as an affinity biosensor. The C-shaped waveguide coupled with microfluidic channel was fabricated by single step patterning of SU8 on an oxidized silicon wafer. The absorbance due to the localized surface plasmon resonance (LSPR) of SU8 waveguide bound gold nano particle (GNP) was found to be linear with refractive index changes between 1.33 and 1.37. A GNP coated C-bent waveguide of 200 μ width with a bend radius of 1 mm gave rise to a sensitivity of ~5 ΔA/RIU at 530 nm as compared to the ~2.5 ΔA/RIU (refractive index units) of the same dimension bare C-bend SU8 waveguide. The resolution of the sensor probe was ~2 × 10(-4) RIU.

Surface enhanced raman spectroscopy on chip

DEFF Research Database (Denmark)

Hübner, Jörg; Anhøj, Thomas Aarøe; Zauner, Dan

2007-01-01

In this paper we report low resolution surface enhanced Raman spectra (SERS) conducted with a chip based spectrometer. The flat field spectrometer presented here is fabricated in SU-8 on silicon, showing a resolution of around 3 nm and a free spectral range of around 100 nm. The output facet...... is projected onto a CCD element and visualized by a computer. To enhance the otherwise rather weak Raman signal, a nanosurface is prepared and a sample solutions is impregnated on this surface. The surface enhanced Raman signal is picked up using a Raman probe and coupled into the spectrometer via an optical...... fiber. The obtained spectra show that chip based spectrometer together with the SERS active surface can be used as Raman sensor....

New gauged N = 8, D = 4 supergravities

International Nuclear Information System (INIS)

Hull, C M

2003-01-01

New gaugings of four-dimensional N = 8 supergravity are constructed, including one which has a Minkowski space vacuum that preserves N = 2 supersymmetry and in which the gauge group is broken to SU(3) x U(1) 2 . Previous gaugings used the form of the ungauged action which is invariant under a rigid SL (8,R) symmetry and promoted a 28-dimensional subgroup (SO(8), SO(p, 8 - p) or the non-semi-simple contraction CSO(p, q, 8 - p - q)) to a local gauge group. Here, a dual form of the ungauged action is used which is invariant under SU*(8) instead of SL (8,R) and new theories are obtained by gauging 28-dimensional subgroups of SU*(8). The gauge groups are non-semi-simple and are different real forms of the CSO(2p, 8 - 2p) groups, denoted as CSO*(2p, 8 - 2p), and the new theories have a rigid SU(2) symmetry. The five-dimensional gauged N = 8 supergravities are dimensionally reduced to D = 4. The D = 5, SO(p, 6 - p) gauge theories reduce, after a duality transformation, to the D = 4, CSO(p, 6 - p, 2) gauging while the SO*(6) gauge theory reduces to the D = 4, CSO*(6, 2) gauge theory. The new theories are related to the old ones via an analytic continuation. The non-semi-simple gaugings can be dualized to forms with different gauge groups

Terceros retenidos según su ubicación

OpenAIRE

Barreto, Milena Natalia

2017-01-01

Los terceros molares empiezan su formación alrededor de los 8 años de edadterminando su amelogénesis a los 18 o 20 años y completando su ápico-formación entre los 20 a 23 años. En la retención interósea (el diente esta rodeado por tejido óseo) o extra ósea (el diente esta rodeado por mucosa gingival) de los terceros molares, la causa principal es por la falta de espacio dentro de la boca. Los signos y síntomas que se presentan son: encías inflamadas y dolorosas disminución apertura bucal, dol...

Au-pattern fabrication on a cellulose film using a polyurethane acrylate mold

International Nuclear Information System (INIS)

Han, Kwangjoon; Kang, Kwang-Sun; Kim, Jaehwan

2009-01-01

This paper deals with a gold micro-patterning process on a cellulose film using a polyurethane acrylate (PUA) mold. Recently, cellulose electro-active paper (EAPap) has been found to be a smart material that can be used for biodegradable sensors, actuators and MEMS devices. However, the hydrophilic and flexible characteristics of cellulose EAPap are major drawbacks for applying a conventional lithography process to fabricate MEMS devices. To overcome these drawbacks, an unconventional lithography process, the so-called micro-transfer printing technique based on a PUA mold, was employed. A master pattern for the PUA mold was fabricated using the conventional photolithography process with an SU-8 photoresist, and the replica of the master pattern was fabricated using PUA. Gold was deposited onto the PUA mold, and a mercaptopropyltrimethoxysilane (MPTMS) self-assembly monolayer was made on the gold surface to securely transfer the gold layer onto the cellulose film. The effect of MPTMS was investigated. Further investigation of the factors to optimize the repeated stamping process will lead to a practical, reusable mold

Broadband Terahertz Refraction Index Dispersion and Loss of Polymeric Dielectric Substrate and Packaging Materials

Science.gov (United States)

Motaharifar, E.; Pierce, R. G.; Islam, R.; Henderson, R.; Hsu, J. W. P.; Lee, Mark

2018-01-01

In the effort to push the high-frequency performance of electronic circuits and signal interconnects from millimeter waves to beyond 1 THz, a quantitative knowledge of complex refraction index values and dispersion in potential dielectric substrate, encapsulation, waveguide, and packaging materials becomes critical. Here we present very broadband measurements of the real and imaginary index spectra of four polymeric dielectric materials considered for use in high-frequency electronics: benzocyclobutene (BCB), polyethylene naphthalate (PEN), the photoresist SU-8, and polydimethylsiloxane (PDMS). Reflectance and transmittance spectra from 3 to 75 THz were made using a Fourier transform spectrometer on freestanding material samples. These data were quantitatively analyzed, taking into account multiple partial reflections from front and back surfaces and molecular bond resonances, where applicable, to generate real and imaginary parts of the refraction index as a function of frequency. All materials showed signatures of infrared active organic molecular bond resonances between 10 and 50 THz. Low-loss transmission windows as well as anti-window bands of high dispersion and loss can be readily identified and incorporated into high-frequency design models.

Quadrilateral Micro-Hole Array Machining on Invar Thin Film: Wet Etching and Electrochemical Fusion Machining

Directory of Open Access Journals (Sweden)

Woong-Kirl Choi

2018-01-01

Full Text Available Ultra-precision products which contain a micro-hole array have recently shown remarkable demand growth in many fields, especially in the semiconductor and display industries. Photoresist etching and electrochemical machining are widely known as precision methods for machining micro-holes with no residual stress and lower surface roughness on the fabricated products. The Invar shadow masks used for organic light-emitting diodes (OLEDs contain numerous micro-holes and are currently machined by a photoresist etching method. However, this method has several problems, such as uncontrollable hole machining accuracy, non-etched areas, and overcutting. To solve these problems, a machining method that combines photoresist etching and electrochemical machining can be applied. In this study, negative photoresist with a quadrilateral hole array pattern was dry coated onto 30-µm-thick Invar thin film, and then exposure and development were carried out. After that, photoresist single-side wet etching and a fusion method of wet etching-electrochemical machining were used to machine micro-holes on the Invar. The hole machining geometry, surface quality, and overcutting characteristics of the methods were studied. Wet etching and electrochemical fusion machining can improve the accuracy and surface quality. The overcutting phenomenon can also be controlled by the fusion machining. Experimental results show that the proposed method is promising for the fabrication of Invar film shadow masks.

Laser assisted fabrication of random rough surfaces for optoelectronics

Energy Technology Data Exchange (ETDEWEB)

Brissonneau, V., E-mail: vincent.brissonneau@im2np.fr [Thales Optronique SA, Avenue Gay-Lussac, 78995 Elancourt (France); Institut Materiaux Microelectronique Nanosciences de Provence, Aix Marseille Universite, Avenue Escadrille Normandie Niemen, 13397 Marseille (France); Escoubas, L. [Institut Materiaux Microelectronique Nanosciences de Provence, Aix Marseille Universite, Avenue Escadrille Normandie Niemen, 13397 Marseille (France); Flory, F. [Institut Materiaux Microelectronique Nanosciences de Provence, Ecole Centrale Marseille, Marseille (France); Berginc, G. [Thales Optronique SA, Avenue Gay-Lussac, 78995 Elancourt (France); Maire, G.; Giovannini, H. [Institut Fresnel, Aix Marseille Universite, Avenue Escadrille Normandie Niemen, 13397 Marseille (France)

2012-09-15

Highlights: Black-Right-Pointing-Pointer Random rough surfaces are photofabricated using an argon ion laser. Black-Right-Pointing-Pointer Speckle and surface correlation function are linked. Black-Right-Pointing-Pointer Exposure beam is modified allowing tuning the correlation. Black-Right-Pointing-Pointer Theoretical examples are presented. Black-Right-Pointing-Pointer Experimental results are compared with theoretical expectation. - Abstract: Optical surface structuring shows great interest for antireflective or scattering properties. Generally, fabricated surface structures are periodical but random surfaces that offer new degrees of freedom and possibilities by the control of their statistical properties. We propose an experimental method to create random rough surfaces on silicon by laser processing followed by etching. A photoresist is spin coated onto a silicon substrate and then exposed to the scattering of a modified laser beam. The beam modification is performed by using a micromirror matrix allowing laser beam shaping. An example of tuning is presented. An image composed of two white circles with a black background is displayed and the theoretical shape of the correlation is calculated. Experimental surfaces are elaborated and the correlation function calculated from height mapping. We finally compared the experimental and theoretical correlation functions.

Unconstrained SU(2) and SU(3) Yang-Mills classical mechanics

International Nuclear Information System (INIS)

Dahmen, B.; Raabe, B.

1992-01-01

A systematic study of contraints in SU(2) and SU(3) Yang-Mills classical mechanics is performed. Expect for the SU(2) case with spatial angular momenta they turn out to be nonholonomic. The complete elimination of the unphysical gauge and rotatinal degrees of freedom is achieved using Dirac's constraint formalism. We present an effective unconstrained formulation of the general SU(2) Yang-Mills classical mechanics as well as for SU(3) in the subspace of vanishing spatial angular momenta that is well suited for further explicit dynamical investigations. (orig.)

Vaccine profile of herpes zoster (HZ/su) subunit vaccine.

Science.gov (United States)

Cunningham, Anthony L; Heineman, Thomas

2017-07-01

Herpes zoster (HZ) causes an often severe and painful rash in older people and may be complicated by prolonged pain (postherpetic neuralgia; PHN) and by dissemination in immune-compromised patients. HZ results from reactivation of latent varicella-zoster virus (VZV) infection, often associated with age-related or other causes of decreased T cell immunity. A live attenuated vaccine boosts this immunity and provides partial protection against HZ, but this decreases with age and declines over 8 years. Areas covered: A new HZ subunit (HZ/su) vaccine combines a key surface VZV glycoprotein (E) with a T cell-boosting adjuvant system (AS01 B ) and is administered by two intramuscular injections two months apart. Expert commentary: HZ/su showed excellent efficacy of ~90% in immunocompetent adults ≥50 and ≥70 years of age, respectively, in the ZOE-50 and ZOE-70 phase III controlled trials. Efficacy was unaffected by advancing age and persisted for >3 years. Approximately 9.5% of subjects had severe, but transient (1-2 days) injection site pain, swelling or redness. Compliance with both vaccine doses was high (95%). The vaccine will have a major impact on HZ management. Phase I-II trials showed safety and immunogenicity in severely immunocompromised patients. Phase III trial results are expected soon.

Unconstrained SU(2) and SU(3) Yang-Mills clasical mechanics

International Nuclear Information System (INIS)

Dahmen, B.; Raabe, B.

1992-01-01

A systematic study of constraints in SU(2) and SU(3) Yang-Mills classical mechanics is performed. Expect for the SU(2) case with vanishing spatial angular momenta they turn out to be non-holonomic. Using Dirac's constraint formalism we achieve a complete elimination of the unphysical gauge and rotational degrees of freedom. This leads to an effective unconstrained formulation both for the full SU(2) Yang-Mills classical mechanics and for the SU(3) case in the subspace of vanishing spatial angular momenta. We believe that our results are well suited for further explicit dynamical investigations. (orig.)

Morphotectonic evolution of Maviboğaz canyon and Suğla polje, SW central Anatolia, Turkey

Science.gov (United States)

Doğan, Uğur; Koçyiğit, Ali

2018-04-01

This study focuses on the morphotectonic evolutionary history of two significant geomorphic features, Suğla structural-border polje and Maviboğaz canyon, located within the Suğla-Seydişehir, Akören-Kavakköy, and Bozkır grabens in the central Taurides. Data were obtained by detailed field mapping of faults, rocks, and geomorphic features. Three phases of tectonic deformation were determined. The three erosional surfaces developed, especially in the form of tectonically controlled steps, during Oligocene-early Miocene, middle Miocene, and late Miocene-early Pliocene, sequentially. Southwest- to northeast-trending karstified hanging paleovalleys are present on the high erosional surfaces, which have been attributed to the end of early Miocene and late Miocene. Faulting-induced tectonic movements enabled the formation of Suğla-Seydişehir paleograben in early Miocene. We suggest that the Maviboğaz canyon was formed by captures at the beginning of late Miocene and late Pliocene and by incision in Late Pliocene-Quaternary, depending on the headward erosion of Çarşamba River. Starting from the beginning of Quaternary, a tensional neotectonic regime became prominent and then a series of modern graben-horst structures formed along the reactivated older grabens. One of these is the Suğla-Seydişehir reactivated graben. Suğla structural-border polje developed within the graben. Total visible tectonic subsidence of the polje is 134 m. Underground capture of surface water occurred on the southern slopes of the graben. Waters of Suğla polje are transported intermittently into Konya basin on the surface and into the Mediterranean basin via natural swallow holes. Beach deposits, water marks, cliffs, and notches marking the late Pleistocene lake level (10 m) and two perched corrosion surfaces ( 50 and 22 m) were detected around the polje.

Effective SU(2) theory for the pseudogap state

Science.gov (United States)

Montiel, X.; Kloss, T.; Pépin, C.

2017-03-01

This paper exposes in a detailed manner the recent findings about the SU(2) scenario for the underdoped phase of the cuprate superconductors. The SU(2) symmetry is formulated as a rotation between the d -wave superconducting (SC) phase and a d -wave charge order. We define the operators responsible for the SU(2) rotations and we derive the nonlinear σ model associated with it. In this framework, we demonstrate that SU(2) fluctuations are massless in finite portions of the Brillouin zone corresponding to the antinodal regions (0 ,π ) and (π ,0 ). We argue that the presence of SU(2) fluctuations in the antinodal region leads to the opening of Fermi arcs around the Fermi surface and to the formation of the pseudogap. Moreover, we show that SU(2) fluctuations lead, in turn, to the emergence of a finite momentum SC order—or pair density wave (PDW)—and more importantly to a new kind of excitonic particle-hole pairs liquid, the resonant excitonic state (RES), which is made of patches of preformed particle-hole pairs with multiple momenta. When the RES liquid becomes critical, we demonstrate that electronic scattering through the critical modes leads to anomalous transport properties. This new finding can account for the strange metal (SM) phase at finite temperature, on the right-hand side of the SC dome, shedding light on another notoriously mysterious part of the phase diagram of the cuprates.

UV lithography-based protein patterning on silicon: Towards the integration of bioactive surfaces and CMOS electronics

Energy Technology Data Exchange (ETDEWEB)

Lenci, S., E-mail: silvia.lenci@iet.unipi.it [Dipartimento di Ingegneria dell' Informazione, via G.Caruso 16, Pisa I-56122 (Italy); Tedeschi, L. [Istituto di Fisiologia Clinica - CNR, via G. Moruzzi 1, Pisa I-56124 (Italy); Pieri, F. [Dipartimento di Ingegneria dell' Informazione, via G.Caruso 16, Pisa I-56122 (Italy); Domenici, C. [Istituto di Fisiologia Clinica - CNR, via G. Moruzzi 1, Pisa I-56124 (Italy)

2011-08-01

A simple and fast methodology for protein patterning on silicon substrates is presented, providing an insight into possible issues related to the interaction between biological and microelectronic technologies. The method makes use of standard photoresist lithography and is oriented towards the implementation of biosensors containing Complementary Metal-Oxide-Semiconductor (CMOS) conditioning circuitry. Silicon surfaces with photoresist patterns were prepared and hydroxylated by means of resist- and CMOS backend-compatible solutions. Subsequent aminosilane deposition and resist lift-off in organic solvents resulted into well-controlled amino-terminated geometries. The discussion is focused on resist- and CMOS-compatibility problems related to the used chemicals. Some samples underwent gold nanoparticle (Au NP) labeling and Scanning Electron Microscopy (SEM) observation, in order to investigate the quality of the silane layer. Antibodies were immobilized on other samples, which were subsequently exposed to a fluorescently labeled antigen. Fluorescence microscopy observation showed that this method provides spatially selective immobilization of protein layers onto APTES-patterned silicon samples, while preserving protein reactivity inside the desired areas and low non-specific adsorption elsewhere. Strong covalent biomolecule binding was achieved, giving stable protein layers, which allows stringent binding conditions and a good binding specificity, really useful for biosensing.

Surface science station of the infrared beamline at SPring-8

International Nuclear Information System (INIS)

Sakurai, M.; Moriwaki, T.; Kimura, H.; Nishida, S.; Nanba, T.

2001-01-01

An experimental station for surface science has been constructed at the infrared beamline (BL43IR) of SPring-8, Japan. The station utilizes synchrotron radiation in the energy range of 100-20000 cm -1 to perform infrared reflection absorption spectroscopy (IRAS) of surfaces. It consists of an experimental section, a preparation chamber, gas handling equipment and a pair of focusing optics. In situ observation of vibrational spectra is possible using both IRAS and high-resolution electron energy loss spectroscopy

String derived exophobic SU(6)×SU(2) GUTs

International Nuclear Information System (INIS)

Bernard, Laura; Faraggi, Alon E.; Glasser, Ivan; Rizos, John; Sonmez, Hasan

2013-01-01

With the apparent discovery of the Higgs boson, the Standard Model has been confirmed as the theory accounting for all sub-atomic phenomena. This observation lends further credence to the perturbative unification in Grand Unified Theories (GUTs) and string theories. The free fermionic formalism yielded fertile ground for the construction of quasi-realistic heterotic-string models, which correspond to toroidal Z 2 ×Z 2 orbifold compactifications. In this paper we study a new class of heterotic-string models in which the GUT group is SU(6)×SU(2) at the string level. We use our recently developed fishing algorithm to extract an example of a three generation SU(6)×SU(2) GUT model. We explore the phenomenology of the model and show that it contains the required symmetry breaking Higgs representations. We show that the model admits flat directions that produce a Yukawa coupling for a single family. The novel feature of the SU(6)×SU(2) string GUT models is that they produce an additional family universal anomaly free U(1) symmetry, and may remain unbroken below the string scale. The massless spectrum of the model is free of exotic states.

Renormalization effects in the SU(16) maximally gauged theory

International Nuclear Information System (INIS)

Mahdavi-Hezaveh, E.

1981-03-01

In the context of a quark-lepton unified gauge theory, when fermionic degrees of freedom are maximally gauged, several intermediate mass scales filling the grand plateau, between 10 2 Gev. and the grand unifying mass scale, M, may exist. In particular, when renormalization effects are taken into account for the SU(16) ''maximal'' gauge symmetry, [in which lepton number is regarded as the fourth color quantum number], it turns out that two intermediate stages governed by the symmetries G 2 =SU(8)sub(I) S SU(8)sub(II) X U(1)sub(F) and G 3 =SU(2)sub(L) X XU(2)sub(R) X SU(4)sub(C) can naturally coexist if Sin 2 theta (Msub(W))>1/6+5/9(α(Msub(W)/αsub(S)(Msub(W)). It is shown that these symmetries break down at a mass scale of the order of Msub(X) approximately equal to 10 4 -10 5 Gev. If neutral current phenomenology (or any other experiment) predicts Sin 2 theta (Msub(W))>0.206, then quark-lepton unification and left-right symmetry simultaneously break down at M approximately equal to 10 4 Gev. (at which αsub(C)(Msub(X) approximately equal to 0.041). It is then argued that apart from proton decay, n-anti n oscillation and neutrinoless double β decay processes, an accurate experimental value of Sin 2 theta (Msub(W)), to α 10 -4 accuracy) plays a crucial role in determining the possible existence of such intermediate stages. (author)

Nucleon spin-flavor structure in the SU(3)-breaking chiral quark model

International Nuclear Information System (INIS)

Song, X.; McCarthy, J.S.; Weber, H.J.

1997-01-01

The SU(3) symmetric chiral quark model, which describes interactions between quarks, gluons, and the Goldstone bosons, explains reasonably well many aspects of the flavor and spin structure of the proton, except for the values of f 3 /f 8 and Δ 3 /Δ 8 . Introducing the SU(3)-breaking effect suggested by the mass difference between the strange and nonstrange quarks, we find that this discrepancy can be removed and better overall agreement obtained. copyright 1997 The American Physical Society

Gauged N=8 supergravity in five dimensions

International Nuclear Information System (INIS)

Guenaydin, M.; Romans, L.J.; Warner, N.P.

1985-01-01

We construct gauged N=8 supergravity theories in five dimensions. Instead of the twenty-seven vector fields of the ungauged theory, the gauged theories contain fifteen vector fields and twelve second-rank antisymmetric tensor fields satisfying self-dual field equations. The fifteen vector fields can be used to gauge any of the fifteen-dimensional semisimple subgroups of SL(6, R), sepcifically SO(p, 6-p) for p=0, 1, 2, 3. The gauged theories also have a physical global SU(1,1) symmetry which survives from the Esub(6(6)) symmetry of the ungauged theory. This SU(1, 1) for the SO(6) gauging is presumably related to that of the chiral N=2 theory in ten dimensions. In our formalism we maintain a composite local USp(8) symmetry analogous to SU(8) in four dimensions. (orig.)

Coherent states related with SU(N) and SU(N,1) groups

International Nuclear Information System (INIS)

Gitman, D.M.; Shelepin, A.L.

1990-01-01

The basis of coherent state (CS) for symmetric presentations of groups SU(N) and SU(N,1) is plotted, its properties being investigated. Evolution of CS is considered. Relation between CS of groups SU(N) and Glauber is ascertained

Chapter 8:Surface Characterization

Science.gov (United States)

Mandla A. Tshabalala; Joseph Jakes; Mark R. VanLandingham; Shaoxia Wang; Jouko. Peltonen

2013-01-01

Surface properties of wood play an important role when wood is used or processed into different commodities such as siding, joinery, textiles, paper, sorption media, or wood composites. Thus, for example, the quality and durability of a wood coating are determined by the surface properties of the wood and the coating. The same is true for wood composites where the...

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.

Science.gov (United States)

Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Choi, Jaewon; Huang, Caili; Jeong, Gajin; Coughlin, E Bryan; Hsu, Yautzong; Yang, XiaoMin; Lee, Kim Y; Kuo, David S; Xiao, Shuaigang; Russell, Thomas P

2015-08-05

Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Broken SU(5) x SU(5) chiral symmetry and the classification of B mesons

International Nuclear Information System (INIS)

Hatzis, M.

1984-01-01

We consider broken SU(5) x SU(5) chiral summetry and we assume that the vacuum is SU(5)-symmetric. Using the observed mass spectrum of pseudoscalar mesons, and setting the bu mass in the range 5.2 +- 0.06 GeV, we predict the masses of bs, bc, and etasub(b) states as well as axial current couplings fsub(i)/fsub(π). SU(5) x SU(5) is found to be consistent with SU(4) x SU(4) breaking. The problem of eta - eta' - eta sub(c) - eta sub(b) mixing is also discussed

Characterization of channel waveguides and tunable microlasers in SU8 doped with rhodamine B fabricated using proton beam writing

International Nuclear Information System (INIS)

Rao, S Venugopal; Bettiol, A A; Watt, F

2008-01-01

We present our results on the fabrication and characterization of buried channel waveguides and tunable microlasers in SU8 doped with rhodamine B achieved using direct writing with a 2.0 MeV proton beam. The channel waveguides, fabricated in single exposure, had an optical propagation loss of -1 at 532 nm measured using the scattering technique while the microlasers with dimensions of 250 x 250 μm 2 had a threshold of ∼150 μJ mm -2 when pumped with 532 nm nanosecond pulses. The emitted wavelength from the microlasers was tunable to an extent of ∼15 nm with increasing pump intensity and different pumping angles. The advantages of such micro-photonic components for the realization of a lab-on-a-chip device are discussed briefly. (fast track communication)

The SU(4), SU(2)xSU(2) chain

International Nuclear Information System (INIS)

Partensky, A.; Maguin, C.

1976-11-01

The main results of a work concerning the calculation of the matrices of the generators of SU(4) in a given (p,p',p'') irreducible representation, in which the states are labelled by the spin quantum numbers, S, MS, are given. Then the SU(4) algebra is defined, the labelling problem of the states is discussed and the Racah formula transformed, which facilitates the calculation. The semi-reduced matrix elements of the Q, Vsup(Q) and Wsup(Q) vectors are defined. Finally an explicit formulation of the matrix elements of Q is given, in the particular case T=p for any S, or S=p for any T; the example of the (3 2 0) irreducible representation is treated

Electrical properties of thin epoxy-based polymer layers filled with n-carbon black particles

Science.gov (United States)

Klanjšek Gunde, Marta; Hauptman, Nina; Maček, Marijan

2008-02-01

The change of resistivity of the epoxy-based nanocomposite was studied in dependence on concentration of dispersed nanoparticles. The SU8 negative-tone photoresist was applied for the polymer matrix and the conductive carbon black powder for the fillings. The largest decrease of resistivity was obtained at 2-3 wt% of fillings whereas at loadings higher that 8 wt% it does not decreases further appreciably. The resistivity of the prepared nanocomposites becomes smaller after the UV-exposure. The applied nanofillings change the viscosity of the material but the spin-coating application still remains reliable and was approved to work well for concentrations of at least up to 3 wt%. The addition of nanofillings up to 2 wt% does not destroy the resolution of photolithography as seen on the standard test pattern with line widths from 2 to 10 μm.

SU(N) Irreducible Schwinger Bosons

OpenAIRE

Mathur, Manu; Raychowdhury, Indrakshi; Anishetty, Ramesh

2010-01-01

We construct SU(N) irreducible Schwinger bosons satisfying certain U(N-1) constraints which implement the symmetries of SU(N) Young tableaues. As a result all SU(N) irreducible representations are simple monomials of $(N-1)$ types of SU(N) irreducible Schwinger bosons. Further, we show that these representations are free of multiplicity problems. Thus all SU(N) representations are made as simple as SU(2).

Elevated soluble urokinase plasminogen activator receptor (suPAR) predicts mortality in Staphylococcus aureus bacteremia

DEFF Research Database (Denmark)

Mölkänen, T; Ruotsalainen, E; Thorball, C W

2011-01-01

The soluble form of urokinase-type plasminogen activator receptor (suPAR) is a new inflammatory marker. High suPAR levels have been shown to associate with mortality in cancer and in chronic infections like HIV and tuberculosis, but reports on the role of suPAR in acute bacteremic infections...... are scarce. To elucidate the role of suPAR in a common bacteremic infection, the serum suPAR levels in 59 patients with Staphylococcus aureus bacteremia (SAB) were measured using the suPARnostic ELISA assay and associations to 1-month mortality and with deep infection focus were analyzed. On day three, after...... the first positive blood culture for S. aureus, suPAR levels were higher in 19 fatalities (median 12.3; range 5.7-64.6 ng/mL) than in 40 survivors (median 8.4; range 3.7-17.6 ng/mL, p = 0.002). This difference persisted for 10 days. The presence of deep infection focus was not associated with elevated su...

SU-E-T-44: Angular Dependence of Surface Dose Enhancement Measured On Several Inhomogeneities Using Radiochromic EBT3 Films

International Nuclear Information System (INIS)

Jansen, A; Schoenfeld, A; Poppinga, D; Chofor, N; Poppe, B

2014-01-01

Purpose: The quantification of the relative surface dose enhancement in dependence on the angle of incidence and the atomic number Z of the surface material. Methods: Experiments were performed with slabs made of aluminum, titanium, copper, silver, dental gold and lead. The metal slabs with equal sizes of 1.0×8.0×8.8mm 3 were embedded in an Octavius 4D phantom (PTW Freiburg, Germany). Radiochromic EBT3 films were used to measure the surface dose for angles of incidence ranging from 0° to 90°. The setup with the metals slabs at the isocenter was irradiated with acceleration voltages of 6MV and 10MV. Water reference measurements were taken under equal conditions. Results: The surface dose enhancement is highest for angles of incidence below 30° and drops significantly for higher. The surface dose enhancement produced by lead and dental gold at 6MV showed a peak of 65%. At 90°, the surface dose enhancement dropped to 15% for both materials. The surface dose enhancements for silver, copper, titanium and aluminum were 45%, 32%, 22% and 12% at 0°, respectively. At an angle of incidence of 80°, the values dropped to 22%, 18%, 12% und 6%. The values for 10MV were very similar. Lead and dental gold showed peaks of 65% und 60%. Their values dropped to 18% at an angle of 90°. The surface dose enhancements for silver, copper, titanium and aluminum were 45%, 30%, 20% and 8% at 0°. At 80° the values dropped to 30%, 20%, 12% and 5%. A dependence of the magnitude of the surface dose enhancement on the atomic number of the surface material can be seen, which is in consistence with literature. Conclusion: The results show that the surface dose enhancements near implant materials with high Z-values should be taken into consideration in radio therapy, even when the angle of incidence is flat

Duality between SU(N)k and SU(k)N WZW models

International Nuclear Information System (INIS)

Naculich, S.G.; Schnitzer, H.J.

1990-01-01

We exhibit a duality of the SU(N) k WZW model under interchange of the group parameter N and the level k. The primary fields of SU(N) k and SU(k) N are related by transposition of their associated Young tableaux. The holomorphic blocks of the four-point functions of the primary fields are in one-to-one correspondence, and satisfy orthogonality and completeness relations with respect to one another. We derive these relations through a path integral realization of the SU(N) k WZW model in terms of a theory of constrained Dirac fermions. (orig.)

On Euclidean connections for su(1,1), suq(1,1) and the algebraic approach to scattering

International Nuclear Information System (INIS)

Ionescu, R.A.

1994-11-01

We obtain a general Euclidean connection for su(1,1) and suq(1,1) algebras. Our Euclidean connection allows an algebraic derivation for the S matrix. These algebraic S matrices reduce to the known ones in suitable circumstances. Also, we obtain a map between su(1,1) and su q (1,1) representations. (author). 8 refs

Nanoporous Silica Templated HeteroEpitaxy: Final LDRD Report.

Energy Technology Data Exchange (ETDEWEB)

Burckel, David Bruce; Koleske, Daniel; Rowen, Adam M.; Williams, John Dalton; Fan, Hongyou; Arrington, Christian Lew

2006-11-01

This one-year out-of-the-box LDRD was focused on exploring the use of porous growth masks as a method for defect reduction during heteroepitaxial crystal growth. Initially our goal was to investigate porous silica as a growth mask, however, we expanded the scope of the research to include several other porous growth masks on various size scales, including mesoporous carbon, and the UV curable epoxy, SU-8. Use of SU-8 as a growth mask represents a new direction, unique in the extensive literature of patterned epitaxial growth, and presents the possibility of providing a single step growth mask. Additional research included investigation of pore viability via electrochemical deposition into high aspect ratio photoresist patterns and pilot work on using SU-8 as a DUV negative resist, another significant potential result. While the late start nature of this project pushed some of the initial research goals out of the time table, significant progress was made. 3 Acknowledgements This work was performed in part at the Nanoscience @ UNM facility, a member of the National Nanotechnology Infrastructure Network, which is supported by the National Science Foundation (Grant ECS 03-35765). Sandia is multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company, for the United Stated Department of Energy's National Nuclear Security Administration under Contract DE-AC04-94AL85000. This work was supported under the Sandia LDRD program (Project 99405). 4

New narrow boson resonances and SU(4) symmetry: Selection rules, SU(4) mixing, and mass formulas

International Nuclear Information System (INIS)

Takasugi, E.; Oneda, S.

1975-01-01

General SU(4) sum rules are obtained for bosons in the theoretical framework of asymptotic SU(4), chiral SU(4) direct-product SU(4) charge algebra, and a simple mechanism of SU(4) and chiral SU(4) direct-product SU(4) breaking. The sum rules exhibit a remarkable interplay of the masses, SU(4) mixing angles, and axial-vector matrix elements of 16-plet boson multiplets. Under a particular circumstance (i.e., in the ''ideal'' limit) this interplay produces selection rules which may explain the remarkable stability of the newly found narrow boson resonances. General SU(4) mass formulas and inter-SU(4) -multiplet mass relations are derived and SU(4) mixing parameters are completely determined. Ground state 1 -- and 0 -+ 16-plets are especially discussed and the masses of charmed and uncharmed new members of these multiplets are predicted

Path integrals and coherent states of SU(2) and SU(1,1)

CERN Document Server

Inomata, Akira; Kuratsuji, Hiroshi

1992-01-01

The authors examine several topical subjects, commencing with a general introduction to path integrals in quantum mechanics and the group theoretical backgrounds for path integrals. Applications of harmonic analysis, polar coordinate formulation, various techniques and path integrals on SU(2) and SU(1, 1) are discussed. Soluble examples presented include particle-flux system, a pulsed oscillator, magnetic monopole, the Coulomb problem in curved space and others.The second part deals with the SU(2) coherent states and their applications. Construction and generalization of the SU(2) coherent sta

suPAR

DEFF Research Database (Denmark)

Hodges, Gethin W; Bang, Casper N; Wachtell, Kristian

2015-01-01

The fundamental role of inflammation in cardiovascular disease (CVD) has prompted interest in numerous biomarkers that detect subclinical levels of inflammation. Soluble urokinase plasminogen activator receptor (suPAR) is a novel biomarker that correlates significantly with cardiovascular events ...... comprehensive review of suPAR in CVD and explore its function and usefulness in predicting cardiovascular events....

Influencia de la formulación de la arena en verde en su difusividad térmica y su efecto en una pieza colada

Directory of Open Access Journals (Sweden)

Noguez, M. E.

2005-12-01

Full Text Available Data evidencing a relation among green sand formulations (% water/% bentonite, w/b, in the ranks 0.2-0.55 for 6, 7, 8 and 9 % bentonite, their heat transfer behaviour, specifically their thermal diffusivity, the casting solidification rate and the resulting macrostructures in aluminium castings are presented.

Se presentan evidencias de que la formulación de una arena en verde (relación entre los porcentajes de agua y de bentonita, a/b, en el rango 0,2-0,55 para 6, 7, 8 y 9 % de bentonita parece determinar su transferencia de calor y, por tanto, su coeficiente de difusividad térmica, lo que influye en la rapidez de solidificación y en las macroestructuras de piezas coladas en aluminio.

Surface representations of Wilson loop expectations in lattice gauge theory

International Nuclear Information System (INIS)

Brydges, D.C.; Giffen, C.; Durhuus, B.; Froehlich, J.

1986-01-01

Expectations of Wilson loops in lattice gauge theory with gauge group G=Z 2 , U(1) or SU(2) are expressed as weighted sums over surfaces with boundary equal to the loops labelling the observables. For G=Z 2 and U(1), the weights are all positive. For G=SU(2), the weights can have either sign depending on the Euler characteristic of the surface. Our surface (or flux sheet-) representations are partial resummations of the strong coupling expansion and provide some qualitative understanding of confinement. The significance of flux sheets with nontrivial topology for permanent confinement in the SU(2)-theory is elucidated. (orig.)

Retrieving background surface reflectance of Himawari-8/AHI using BRDF modeling

Science.gov (United States)

Choi, Sungwon; Seo, Minji; Lee, Kyeong-sang; Han, Kyung-soo

2017-04-01

In these days, remote sensing is more important than past. And retrieving surface reflectance in remote sensing is also important. So there are many ways to retrieve surface reflectance by my countries with polar orbit and geostationary satellite. We studied Bidirectional Reflectance Distribution Function (BRDF) which is used to retrieve surface reflectance. In BRDF equation, we calculate surface reflectance using BRD components and angular data. BRD components are to calculate 3 of scatterings, isotropic geometric and volumetric scattering. To make Background Surface Reflectance (BSR) of Himawari-8/AHI. We used 5 bands (band1, band2, band3, band4, band5) with BRDF. And we made 5 BSR for 5 channels. For validation, we compare BSR with Top of canopy (TOC) reflectance of AHI. As a result, bias are from -0.00223 to 0.008328 and Root Mean Square Error (RMSE) are from 0.045 to 0.049. We think BSR can be used to replace TOC reflectance in remote sensing to improve weakness of TOC reflectance.

Directed Self-assembly of Block Copolymer with Sub-15 nm Domain Spacing Using Nanoimprinted Photoresist Templates

Science.gov (United States)

Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Coughlin, E. Bryan; Xiao, Shuaigang; Russell, Thomas

There has been increasing interest in preparing block copolymer thin films with ultra-small domain spacings for use as etching masks for ultra-high resolution nanolithography. One method to prepare block copolymer materials with small feature sizes is salt doping, increasing the Flory-Huggins interaction and allowing microphase separation to be maintained at lower molecular weights. Lamellae-forming P2VP- b-PS- b-P2VP block copolymer with various molecular weight was synthesized using RAFT polymerization with a dual functional chain transfer agent. Copper (II) Chloride or Gold (III) chloride was found to be selectively associated with P2VP block and increase the unfavorable interactions between PS and P2VP blocks, driving the disordered block copolymer into the ordered state. A 14 nm lamellar spacing of P2VP- b-PS- b-P2VP thin film was prepared using copper (II) Chloride doping after acetone vapor annealing on neutral brushes. Metallic nano-wire arrays were prepared after selective infiltration of platinum salt into the P2VP domain and oxygen plasma treatment. The directed self-assembly of salt doped P2VP- b-PS- b-P2VP triblock copolymer having long-rang lateral order on nanoimprinted photoresist templates with shallow trenches was also studied.

Analiza kvalitete procesa sušenja u klasičnim komornim sušionicama

OpenAIRE

Sedlar, Tomislav; Pervan, Stjepan

2010-01-01

U radu su dani rezultati ispitivanja kvalitete sušenja u klasičnoj komornoj sušionici. Ispitivanje se temelji na novoj metodologiji kojom se prikazuje razina uspješnosti procesa sušenja na temelju analize kvalitete tog procesa u klasičnoj komornoj sušionici, korištenjem znanstveno unaprijeđene verzije liste provjere u svakodnevnoj praktičnoj primjeni. Za verificiranje nove metodologije ispitivanja izabrano je poduzeće koje se specijaliziralo za izradu lamel parketa i klasičnog parketa. U s...

desde su cultura

Directory of Open Access Journals (Sweden)

Luz Ángela Argote O.

2008-01-01

Full Text Available Para explorar las prácticas sobre protección y cuidado durante la transición del climaterio a la menopausia se llevó a cabo un estudio en mujeres colombianas afrodescendientes que viven en el Distrito de Aguablanca, Cali, Colombia, a fin de evaluar los factores socioculturales que influyen en su cuidado. Se siguió la etnoenfermería con el objeto de averiguar la perspectiva femenina étnica, e identificar las prácticas beneficiosas y de riesgo para su salud. La investigación tuvo como participantes claves a 17 mujeres. En la consolidación de la muestra se aplicaron los criterios de saturación de datos. En los resultados se evidenció la relación de las mujeres con su propio cuerpo, su defensa y fortificación desde la menarquia como fase preparatoria de sus funciones reproductivas, hasta cuando aparece la menopausia. De acuerdo con su cultura, si no tienen en cuenta estas prácticas tradicionales, sufrirán diversas dolencias en la etapa final de su periodo de procreación. Los cuidados sobresalientes se relacionan con el significado de la sangre, así como con el ejercicio de la sexualidad, la limpieza, la alimentación especial y el equilibrio que se debe guardar entre el calor y el frío. Las entrevistadas atribuyen a la menopausia cambios en su cuerpo, en sus diferencias emocionales de conducta y en las expectativas de la sexualidad. Para el presente estudio estos hallazgos se agruparon en tres temas principales: sentir los profundos cambios en la vida: el cuerpo; sentir los cambios en los estados de ánimo; y vivir la sexualidad.

Homogeneous nano-patterning using plasmon-assisted photolithography

Energy Technology Data Exchange (ETDEWEB)

Ueno, Kosei [Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021 (Japan); PRESTO, Japan Science and Technology Agency, Kawaguchi 332-0012 (Japan); Takabatake, Satoaki; Onishi, Ko; Itoh, Hiroko; Nishijima, Yoshiaki [Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0021 (Japan); Misawa, Hiroaki [PRESTO, Japan Science and Technology Agency, Kawaguchi 332-0012 (Japan)

2011-07-04

We report an innovative lithography system appropriate for fabricating sharp-edged nanodot patterns with nanoscale accuracy using plasmon-assisted photolithography. The key technology is two-photon photochemical reactions of a photoresist induced by plasmonic near-field light and the scattering component of the light in a photoresist film. The scattering component of the light is a radiation mode from higher order localized surface plasmon resonances scattered by metallic nanostructures.

UTC(SU) and EOP(SU) - the only legal reference frames of Russian Federation

Science.gov (United States)

Koshelyaevsky, Nikolay B.; Blinov, Igor Yu; Pasynok, Sergey L.

2015-08-01

There are two legal time reference frames in Russian Federation. UTC(SU) deals with atomic time and play a role of reference for legal timing through the whole country. The other one, EOP(SU), deals with Earth's orientation parameters and provides the official EOP data for scientific, technical and metrological applications in Russia.The atomic time is based on two essential hardware components: primary Cs fountain standards and ensemble of continuously operating H-masers as a time unit/time scale keeper. Basing on H-maser intercomparison system data, regular H-maser frequency calibration against Cs standards and time algorithm autonomous TA(SU) time scale is maintained by the Main Metrological Center. Since 2013 time unit in TA(SU) is the second (SU) reproduced independently by VNIIFTRI Cs primary standards in accordance to it’s definition in the SI. UTC(SU) is relied on TA(SU) and steering to UTC basing on TWSTFT/GNSS time link data. As a result TA(SU) stability level relative to TT considerably exceeds 1×10-15 for sample time one month and more, RMS[UTC-UTC(SU)] ≤ 3 ns for the period of 2013-2015. UTC(SU) is broadcasted by different national means such as specialized radio and TV stations, NTP servers and GLONASS. Signals of Russian radio stations contains DUT1 and dUT1 values at 0.1s and 0.02s resolution respectively.The definitive EOP(SU) are calculated by the Main Metrological Center basing on composition of the eight independent individual EOP data streams delivered by four Russian analysis centers: VNIIFTRI, Institute of Applied Astronomy, Information-Analytical Center of Russian Space Agency and Analysis Center of Russian Space Agency. The accuracy of ultra-rapid EOP values for 2014 is estimated ≤ 0.0006" for polar motion, ≤ 70 microseconds for UT1-UTC and ≤ 0.0003" for celestial pole offsets respectively.The other VNIIFTRI EOP activities can be grouped in three basic directions:- arrangement and carrying out GNSS and SLR observations at five

Dark revelations of the [SU(3)]3 and [SU(3)]4 gauge extensions of the standard model

Science.gov (United States)

Kownacki, Corey; Ma, Ernest; Pollard, Nicholas; Popov, Oleg; Zakeri, Mohammadreza

2018-02-01

Two theoretically well-motivated gauge extensions of the standard model are SU(3)C × SU(3)L × SU(3)R and SU(3)q × SU(3)L × SU(3)l × SU(3)R, where SU(3)q is the same as SU(3)C and SU(3)l is its color leptonic counterpart. Each has three variations, according to how SU(3)R is broken. It is shown here for the first time that a built-in dark U(1)D gauge symmetry exists in all six versions. However, the corresponding symmetry breaking pattern does not reduce properly to that of the standard model, unless an additional Z2‧ symmetry is defined, so that U(1)D ×Z2‧ is broken to Z2 dark parity. The available dark matter candidates in each case include fermions, scalars, as well as vector gauge bosons. This work points to the possible unity of matter with dark matter, the origin of which may not be ad hoc.

Dark revelations of the [SU(3]3 and [SU(3]4 gauge extensions of the standard model

Directory of Open Access Journals (Sweden)

Corey Kownacki

2018-02-01

Full Text Available Two theoretically well-motivated gauge extensions of the standard model are SU(3C×SU(3L×SU(3R and SU(3q×SU(3L×SU(3l×SU(3R, where SU(3q is the same as SU(3C and SU(3l is its color leptonic counterpart. Each has three variations, according to how SU(3R is broken. It is shown here for the first time that a built-in dark U(1D gauge symmetry exists in all six versions. However, the corresponding symmetry breaking pattern does not reduce properly to that of the standard model, unless an additional Z2′ symmetry is defined, so that U(1D×Z2′ is broken to Z2 dark parity. The available dark matter candidates in each case include fermions, scalars, as well as vector gauge bosons. This work points to the possible unity of matter with dark matter, the origin of which may not be ad hoc.

Minimal Supersymmetric $SU(4) \\to SU(2)_L \\to SU(2)_R$

CERN Document Server

King, S F

1998-01-01

We present a minimal string-inspired supersymmetric $SU(4) \\times SU(2)_L potential in this model, based on a generalisation of that recently proposed by Dvali, Lazarides and Shafi. The model contains a global U(1) R-symmetry and reduces to the MSSM at low energies. However it improves on the MSSM since it explains the magnitude of its $\\mu$ term and gives a prediction for $\\tan \\beta both `cold' and `hot' dark matter candidates. A period of hybrid inflation above the symmetry breaking scale is also possible in this model. Finally it suggests the existence of `heavy' charge $\\pm e/6$ (colored) and $\\pm e/2$ (color singlet) states.

SuPAR predicts postoperative complications and mortality in patients with asymptomatic aortic stenosis

DEFF Research Database (Denmark)

Hodges, Gethin W; Bang, Casper N; Eugen-Olsen, Jesper

2018-01-01

complications with a HR of 2.7 (95% CI 1.5 to 5.1, P=0.002), per doubling in suPAR. After adjusting for the European System for Cardiac Operative Risk Evaluation or Society of Thoracic Surgeons risk score, suPAR remained associated with postoperative mortality with a HR 3.2 (95% CI 1.2 to 8.6, P=0.025) and 2...

The influence of hard-baking temperature applied for SU8 sensor layer on the sensitivity of capacitive chemical sensor

Science.gov (United States)

Klanjšek Gunde, Marta; Hauptman, Nina; Maček, Marijan; Kunaver, Matjaž

2009-06-01

SU8, the near-UV photosensitive epoxy-based polymer was used as a sensor layer in the capacitive chemical sensor, ready for integration with a generic double-metal CMOS technology. It was observed that the response of the sensor slowly increases with the temperature applied in hard-baking process as long as it remains below 300°C. At this temperature the response of the sensor abruptly increases and becomes almost threefold. It was shown that fully crosslinked structure of the sensor layer becomes opened and disordered when the sensor is hard-baked at temperatures between 300°C and 320°C, that is, still well below the degradation temperature of the polymer. These changes in chemical structure were analyzed by Fourier-transform infrared spectroscopy. The temperature-dependent changes of the sensor layer structure enable one to prepare a combination of capacitive chemical sensors with good discrimination between some volatile organic compounds.

SU(6), baryonic decays of B-mesons and CP

International Nuclear Information System (INIS)

Wu, D.

1990-01-01

In this paper the four fermion weak decay Hamiltonian is expressed in terms of quark-antiquark creation operators with specific spin orientations. Then the SU(6) symmetry of the strong interactions among light quarks is imposed to find 8 invariant decay amplitudes for two body charmful baryonic decays of the B-mesons, 3 S-waves, 4 P- waves and 1 D-wave. Λ c branching ratio and some exclusive branching ratios are calculated based on the assumption of two body dominance in baryonic decay modes. Results on two body mesonic decays are also given. Relation between the SU(6) scheme and the quark diagram scheme is discussed

SU-E-T-348: Effect of Treatment Table and Immobilization Devices On Surface Dose When Using a GRID Technique

Energy Technology Data Exchange (ETDEWEB)

Gajdos, S; Donaghue, J [Akron General Medical Center, Akron, OH (United States)

2015-06-15

Purpose: To determine the increase of surface dose of MLC-designed GRID therapy in the presence of immobilization devices and treatment table. Methods: To create a GRID field, our facility utilizes an MLC consisting of four millimeter wide leaves. The field is designed to have aperture sizes of 0.8 cm X 0.8 cm with inter-aperture distance of 3.2 cm. Gafchromic EBT3 film was placed between the surface of a solid water phantom and the immobilization device. The treatment table was also present within the beam path. The devices consist of carbon fiber exterior shell. A piece of film was also placed at maximal depth for the photon energy of 10 MV. Image files were converted to dose per a calibration curve based on the selected red channel. The surface dose to maximum dose was established by comparing the ratio of seven centrally located aperture regions-of-interest and four adjacent inter-aperture regions-of-interest were measured with the available software tools. Results: With no devices present in beam path, the ratio of surface dose to maximum dose was 11.5% ± 0.3% for aperture region and 7.0% ± 0.1% for inter-aperture region. When devices are present, the ratio of surface dose to maximum dose was 45.2% ± 0.5% and 33.8% ± 1.1%, respectively. Due to the presence of devices, the surface dose increases in aperture region by 3.8 times or in the inter-aperture region by 4.7 times. Conclusion: The purpose of using GRID technique is to deliver a single fractional dose in range of 15–20 Gy to a bulky lesion while also preserving skin tolerance. The increase of surface dose due to devices placed in beam path may increase the chance of skin toxicity in GRID therapy. Care should be used to determine best manageable patient immobilization while considering skin dose especially for posteriorly located lesions.

Duality relations between SU(N)k and SU(k)NWZW models and their braid matrices

International Nuclear Information System (INIS)

Naculich, S.G.; Schnitzer, H.J.

1990-01-01

Dual relations are found between the primary fields, correlators, and conformal blocks of SU(N) k and SU(k) N WZW models, which in turn imply dual relations between the braid matrices of the two theories. These results are a consequence of the fact that the spaces of conformal blocks of SU(N) k and SU(k) N correlation functions are dual. (orig.)

Embedded top-coat for reducing the effect out of band radiation in EUV lithography

Science.gov (United States)

Du, Ke; Siauw, Meiliana; Valade, David; Jasieniak, Marek; Voelcker, Nico; Trefonas, Peter; Thackeray, Jim; Blakey, Idriss; Whittaker, Andrew

2017-03-01

Out of band (OOB) radiation from the EUV source has significant implications for the performance of EUVL photoresists. Here we introduce a surface-active polymer additive, capable of partitioning to the top of the resist film during casting and annealing, to protect the underlying photoresist from OOB radiation. Copolymers were prepared using reversible addition-fragmentation chain transfer (RAFT) polymerization, and rendered surface active by chain extension with a block of fluoro-monomer. Films were prepared from the EUV resist with added surface-active Embedded Barrier Layer (EBL), and characterized using measurements of contact angles and spectroscopic ellipsometry. Finally, the lithographic performance of the resist containing the EBL was evaluated using Electron Beam Lithography exposure

Optical Amplification at 1525 nm in BaYF5: 20% Yb3+, 2% Er3+ Nanocrystals Doped SU-8 Polymer Waveguide

Directory of Open Access Journals (Sweden)

Pengcheng Zhao

2014-01-01

Full Text Available We demonstrated optical amplification in BaYF5: 20% Yb3+, 2% Er3+ (BYF nanocrystals doped polymer waveguide. BYF nanocrystals with an average size of ∼13 nm were synthesized by a high-boiling solvent process. Intense 1.53 μm fluorescence was obtained in the nanocrystals under excitation at 980 nm. An optical polymer waveguide was fabricated by using BYF nanocrystals doped SU-8 polymer as the core material. A relative optical gain of ∼10.4 dB at 1525 nm was achieved in a 1.1 cm long waveguide for an input signal power of ∼0.09 mW and a pump power of ∼212 mW.

Suspended 3D pyrolytic carbon microelectrodes for electrochemistry

DEFF Research Database (Denmark)

Hemanth, Suhith; Caviglia, Claudia; Keller, Stephan Sylvest

2017-01-01

with cyclic voltammetry (CV) and impedance spectroscopy (EIS) using potassium ferri-ferrocyanide redox probe in a custom made batch system with magnetic clamping. Different 3D pyrolytic carbon microelectrodes were compared and the optimal design displayed twice the peak current and half the charge transfer......Carbon microelectrodes have a wide range of applications because of their unique material properties and biocompatibility. This work presents the fabrication and characterization of suspended pyrolytic carbon microstructures serving as three-dimensional (3D) carbon microelectrodes...... for electrochemical applications. A 3D polymer template in epoxy based photoresist (SU-8) was fabricated with multiple steps of UV photolithography and pyrolysed at 900 °C to obtain 3D carbon microelectrodes. The pyrolytic carbon microstructures were characterized by SEM, Raman spectroscopy and XPS to determine...

A study of angular dependence in the ablation rate of polymers by nanosecond pulses

Science.gov (United States)

Pedder, James E. A.; Holmes, Andrew S.

2006-02-01

Measurements of ablation rate have traditionally been carried out only at normal incidence. However, in real-world applications ablation is often carried out at oblique angles, and it is useful to have prior knowledge of the ablation rate in this case. Detailed information about the angular dependence is also important for the development of ablation simulation tools, and can provide additional insight into the ablation mechanism. Previously we have reported on the angular dependence of direct-write ablation at 266 nm wavelength in solgel and polymer materials. In this paper we present a systematic study of angular dependence for excimer laser ablation of two polymer materials of interest for microfabrication: polycarbonate and SU8 photoresist. The results are used to improve simulation models to aid in mask design.

Study of operational parameters on the performance of micro PEMFCs with different flow fields

International Nuclear Information System (INIS)

Hsieh, S.-S.; Yang, S.-H.; Kuo, J.-K.; Huang, C.-F.; Tsai, H.-H.

2006-01-01

The effects of different operating parameters on micro PEMFC performances were experimentally studied for three different flow field configurations (interdigitated, mesh, and serpentine). Experiments with different cell operating temperatures and different backpressures on the H 2 flow channels, as well as various combinations of these parameters, have been conducted for three different flow geometries. The micro PEMFCs were designed and fabricated inhouse through a deep UV lithography technique and the SU-8 photoresist was used as microstructure material for the fuel cell flow field plates. Results are presented in the form of polarization VI curves and PI curves under different operating conditions. The possible transport mechanisms associated with the parametric effects were discussed. In addition, it was found that among the three flow patterns considered, significant improvements can be reached with a specified flow geometry

Los Grammy Latino, su meta inicial y su fin comercial

Directory of Open Access Journals (Sweden)

Marinés Arroyo Sotomayor

2015-01-01

Full Text Available El artículo refiere lo que es este festival musical que premia el talento latino, quienes participan, su meta inicial y su fin comercial. Muestra que a pesar de la tradición de intolerancia del exilio cubano, la música sirvió, una vez más, como puente de cultura

Classification of three-family grand unification in string theory. II. The SU(5) and SU(6) models

International Nuclear Information System (INIS)

Kakushadze, Z.; Tye, S.H.

1997-01-01

Requiring that supersymmetric SU(5) and SU(6) grand unifications in the heterotic string theory must have three chiral families, adjoint (or higher representation) Higgs fields in the grand unified gauge group, and a non-Abelian hidden sector, we construct such string models within the framework of free conformal field theory and asymmetric orbifolds. Within this framework, we construct all such string models via Z 6 asymmetric orbifolds that include a Z 3 outerautomorphism, the latter yielding a level-three current algebra for the grand unification gauge group SU(5) or SU(6). We then classify all such Z 6 asymmetric orbifolds that result in models with a non-Abelian hidden sector. All models classified in this paper have only one adjoint (but no other higher representation) Higgs field in the grand unified gauge group. This Higgs field is neutral under all other gauge symmetries. The list of hidden sectors for three-family SU(6) string models are SU(2), SU(3), and SU(2)circle-times SU(2). In addition to these, three-family SU(5) string models can also have an SU(4) hidden sector. Some of the models have an apparent anomalous U(1) gauge symmetry. copyright 1997 The American Physical Society

SU(2) and SU(1,1) squeezing of interacting radiation modes

International Nuclear Information System (INIS)

Abdalla Sebawe, M.; Faisal El-Orany, A.A.; Perina, J.

2000-01-01

In this communication we discuss SU(1,1) and SU(2) squeezing of an interacting system of radiation modes in a quadratic medium in the framework of Lie algebra. We show that regardless of which state being initially considered, squeezing can be periodically generated. (authors)

Variações da cor preta e negra na pintura de Eduardo Sued

Directory of Open Access Journals (Sweden)

Marcela Rangel

2009-01-01

Full Text Available Eduardo Sued transforma o pigmento preto de sua paleta física em campos cromáticos em suas pinturas. Ele costuma diferenciar a cor preta da cor negra. Diz que o preto torna-se negro à medida que a escuridão e a intensidade vão se apossando dele. Para Sued, o preto permite o passeio apenas em sua superfície, enquanto no negro há profundidade. "Há noites pretas e noites negras!" Nesta entrevista, Sued discorre sobre o que fomenta sua produção pictórica, em especial o uso que faz da tinta preta para criar seus pretos e seus negros.Eduardo Sued transforms the black pigment of his physical palette in color fields on his paintings. He usually distinguishes black from "darkblack". He says black goes to "dark black" as darkness and intensity take hold of it. For him, the black works only on its surface, while "darkblack" is deep. "There are black nights and 'darkblack' nights!" In this interview Sued talks about what promotes his pictorial production, in particular his use of black paint to create his black and darkblack fields.

Baryon spectroscopy and SU(6)

International Nuclear Information System (INIS)

Litchfield, P.

1977-09-01

An elementary account of the SU(6) formalism for baryons is given. The assignment of the known resonances to SU(6) multiplets is discussed and an experimental scheme given for the spectrum of SU(6) x 0(2) multiplets. (author)

Calculation of t8/5 by response surface methodology for electric arc welding applications

Directory of Open Access Journals (Sweden)

Meseguer-Valdenebro José Luis

2014-01-01

Full Text Available One of the greatest difficulties traditionally found in stainless steel constructions has been the execution of welding parts in them. At the present time, the available technology allows us to use arc welding processes for that application without any disadvantage. Response surface methodology is used to optimise a process in which the variables that take part in it are not related to each other by a mathematical law. Therefore, an empiric model must be formulated. With this methodology the optimisation of one selected variable may be done. In this work, the cooling time that takes place from 800 to 500ºC, t8/5, after TIG welding operation, is modelled by the response surface method. The arc power, the welding velocity and the thermal efficiency factor are considered as the variables that have influence on the t8/5 value. Different cooling times,t8/5, for different combinations of values for the variables are previously determined by a numerical method. The input values for the variables have been experimentally established. The results indicate that response surface methodology may be considered as a valid technique for these purposes.

Inflation and monopoles in supersymmetric SU(4)c x SU(2)L x SU(2)R

International Nuclear Information System (INIS)

Jeannerot, R.; Khalil, S.; Lazarides, G.; Shafi, Q.

2000-02-01

We show how hybrid inflation can be successfully realized in a supersymmetric model with gauge group G PS = SU(4) c x SU(2) L x SU(2) R . By including a non-renormalizable superpotential term, we generate an inflationary valley along which G PS is broken to the standard model gauge group. Thus, catastrophic production of the doubly charged magnetic monopoles, which are predicted by the model, cannot occur at the end of inflation. The results of the cosmic background explorer can be reproduced with natural values (of order 10 -3 ) of the relevant coupling constant, and symmetry breaking scale of G PS close to 10 16 GeV. The spectral index of density perturbations lies between unity and 0.94. Moreover, the μ-term is generated via a Peccei-Quinn symmetry and proton is practically stable. Baryogenesis in the universe takes place via leptogenesis. The low deuterium abundance constraint on the baryon asymmetry, the gravitino limit on the reheat temperature and the requirement of almost maximal ν μ - ν τ mixing from SuperKamiokande can be simultaneously met with m νμ , m ντ and heaviest Dirac neutrino mass determined from the large angle MSW resolution of the solar neutrino problem, the SuperKamiokande results and SU(4) c symmetry respectively. (author)

Conformally parametrized surfaces associated with CPN-1 sigma models

International Nuclear Information System (INIS)

Grundland, A M; Hereman, W A; Yurdusen, I-dot

2008-01-01

Two-dimensional parametrized surfaces immersed in the su(N) algebra are investigated. The focus is on surfaces parametrized by solutions of the equations for the CP N-1 sigma model. The Lie-point symmetries of the CP N-1 model are computed for arbitrary N. The Weierstrass formula for immersion is determined and an explicit formula for a moving frame on a surface is constructed. This allows us to determine the structural equations and geometrical properties of surfaces in R N 2 -1 . The fundamental forms, Gaussian and mean curvatures, Willmore functional and topological charge of surfaces are given explicitly in terms of any holomorphic solution of the CP 2 model. The approach is illustrated through several examples, including surfaces immersed in low-dimensional su(N) algebras

Chemical etching of Tungsten thin films for high-temperature surface acoustic wave-based sensor devices

Energy Technology Data Exchange (ETDEWEB)

Spindler, M., E-mail: m.spindler@ifw-dresden.de [IFW Dresden, SAWLab Saxony, P.O. Box 270116, D-01171 Dresden (Germany); Herold, S.; Acker, J. [BTU Cottbus – Senftenberg, Faculty of Sciences, P.O. Box 101548, 01968 Senftenberg (Germany); Brachmann, E.; Oswald, S.; Menzel, S.; Rane, G. [IFW Dresden, SAWLab Saxony, P.O. Box 270116, D-01171 Dresden (Germany)

2016-08-01

Surface acoustic wave devices are widely used as wireless sensors in different application fields. Recent developments aimed to utilize those devices as temperature sensors even in the high temperature range (T > 300 °C) and in harsh environmental conditions. Therefore, conventional materials, which are used for the substrate and for the interdigital transducer finger electrodes such as multilayers or alloys based on Al or Cu have to be exchanged by materials, which fulfill some important criteria regarding temperature related effects. Electron beam evaporation as a standard fabrication method is not well applicable for depositing high temperature stable electrode materials because of their very high melting points. Magnetron sputtering is an alternative deposition process but is also not applicable for lift-off structuring without any further improvement of the structuring process. Due to a relatively high Ar gas pressure of about 10{sup −1} Pa, the sidewalls of the photoresist line structures are also covered by the metallization, which subsequently prevents a successful lift-off process. In this study, we investigate the chemical etching of thin tungsten films as an intermediate step between magnetron sputtering deposition of thin tungsten finger electrodes and the lift-off process to remove sidewall covering for a successful patterning process of interdigital transducers. - Highlights: • We fabricated Tungsten SAW Electrodes by magnetron sputtering technology. • An etching process removes sidewall covering of photoresist, which allows lift-off. • Tungsten etching rates based on a hydrogen peroxide solutions were determined.

On the SU(2)× SU(2) symmetry in the Hubbard model

Science.gov (United States)

Jakubczyk, Dorota; Jakubczyk, Paweł

2012-08-01

We discuss the one-dimensional Hubbard model, on finite sites spin chain, in context of the action of the direct product of two unitary groups SU(2)× SU(2). The symmetry revealed by this group is applicable in the procedure of exact diagonalization of the Hubbard Hamiltonian. This result combined with the translational symmetry, given as the basis of wavelets of the appropriate Fourier transforms, provides, besides the energy, additional conserved quantities, which are presented in the case of a half-filled, four sites spin chain. Since we are dealing with four elementary excitations, two quasiparticles called "spinons", which carry spin, and two other called "holon" and "antyholon", which carry charge, the usual spin- SU(2) algebra for spinons and the so called pseudospin-SU(2) algebra for holons and antiholons, provide four additional quantum numbers.

New hierarchy in GUTs based on SU(n,1)/SU(n)U(1) SUGRA

International Nuclear Information System (INIS)

Hayashi, M.J.; Murayama, Akihiro

1985-01-01

Grand unified theories (GUTs) in the framework of SU(n, 1)/SU(n) x U(1) supergravity are discussed which naturally generate a new hierarchy, Msub(P) (Planck mass): Msub(X) (GUT scale):msub(3/2) (gravitino mass):m (explicit supersymmetry breaking scale)=1:epsilon:epsilon 3 :epsilon 5 α(Msub(X)) with Msub(P) as the only input mass scale. The SUSY breaking scale m is expected to be fixed radiatively as mproportionalMsub(W), i.e., epsilonproportional10 -3 . Our method would be applicable to any GUT based on SU(n, 1)/SU(n) x U(1) supergravity. (orig.)

Dose-finding and pharmacokinetic study of cisplatin, gemcitabine, and SU5416 in patients with solid tumors

NARCIS (Netherlands)

Kuenen, Bart C.; Rosen, Lee; Smit, Egbert F.; Parson, Mandy R. N.; Levi, Marcel; Ruijter, Rita; Huisman, Holger; Kedde, Marc A.; Noordhuis, Paul; van der Vijgh, Wim J. F.; Peters, Godefridus J.; Cropp, Gillian F.; Scigalla, Paul; Hoekman, Klaus; Pinedo, Herbert M.; Giaccone, Giuseppe

2002-01-01

Purpose: To investigate the feasibility and pharmacokinetics of the combination cisplatin, gemcitabine, and SU5416. Patients and Methods: Patients received cisplatin 80 mg/m(2) on day 1, gemcitabine 1,250 mg/m(2) on days 1 and 8, repeated every 3 weeks, and SU5416 (85 and 145 mg/m(2)) intravenously

Borneol Is a TRPM8 Agonist that Increases Ocular Surface Wetness.

Directory of Open Access Journals (Sweden)

Gui-Lan Chen

Full Text Available Borneol is a compound widely used in ophthalmic preparations in China. Little is known about its exact role in treating eye diseases. Here we report that transient receptor potential melastatin 8 (TRPM8 channel is a pharmacological target of borneol and mediates its therapeutic effect in the eyes. Ca2+ measurement and electrophysiological recordings revealed that borneol activated TRPM8 channel in a temperature- and dose-dependent manner, which was similar to but less effective than the action of menthol, an established TRPM8 agonist. Borneol significantly increased tear production in guinea pigs without evoking nociceptive responses at 25°C, but failed to induce tear secretion at 35°C. In contrast, menthol evoked tearing response at both 25 and 35°C. TRPM8 channel blockers N-(3-Aminopropyl-2-[(3-methylphenylmethoxy]-N-(2-thienylmethylbenzamide hydrochloride (AMTB and N-(4-tert-butylphenyl-4-(3-chloropyridin-2-ylpiperazine-1-carboxamide (BCTC abolished borneol- and menthol-induced tear secretion. Borneol at micromolar concentrations did not affect the viability of human corneal epithelial cells. We conclude that borneol can activate the cold-sensing TRPM8 channel and modestly increase ocular surface wetness, which suggests it is an active compound in ophthalmic preparations and particularly useful in treating dry eye syndrome.

Short-term exposure to oleandrin enhances responses to IL-8 by increasing cell surface IL-8 receptors

Science.gov (United States)

Raviprakash, Nune; Manna, Sunil Kumar

2014-01-01

BACKGROUND AND PURPOSE One of the first steps in host defence is the migration of leukocytes. IL-8 and its receptors are a chemokine system essential to such migration. Up-regulation of these receptors would be a viable strategy to treat dysfunctional host defence. Here, we studied the effects of the plant glycoside oleandrin on responses to IL-8 in a human monocytic cell line. EXPERIMENTAL APPROACH U937 cells were incubated with oleandrin (1-200 ng mL−1) for either 1 h (pulse) or for 24 h (non-pulse). Apoptosis; activation of NF-κB, AP-1 and NFAT; calcineurin activity and IL-8 receptors (CXCR1 and CXCR2) were measured using Western blotting, RT-PCR and reporter gene assays. KEY RESULTS Pulse exposure to oleandrin did not induce apoptosis or cytoxicity as observed after non-pulse exposure. Pulse exposure enhanced activation of NF-κB induced by IL-8 but not that induced by TNF-α, IL-1, EGF or LPS. Exposure to other apoptosis-inducing compounds (azadirachtin, resveratrol, thiadiazolidine, or benzofuran) did not enhance activation of NF-κB. Pulse exposure to oleandrin increased expression of IL-8 receptors and chemotaxis, release of enzymes and activation of NF-κB, NFAT and AP-1 along with increased IL-8-mediated calcineurin activation, and wound healing. Pulse exposure increased numbers of cell surface IL-8 receptors. CONCLUSIONS AND IMPLICATIONS Short-term (1 h; pulse) exposure to a toxic glycoside oleandrin, enhanced biological responses to IL-8 in monocytic cells, without cytoxicity. Pulse exposure to oleandrin could provide a viable therapy for those conditions where leukocyte migration is defective. PMID:24172227

Distinguishing between SU(5) and flipped SU(5)

Energy Technology Data Exchange (ETDEWEB)

Dorsner, Ilja [Abdus Salam International Centre for Theoretical Physics, Strada Costiera 11, 34014 Trieste (Italy); Fileviez Perez, Pavel [Abdus Salam International Centre for Theoretical Physics, Strada Costiera 11, 34014 Trieste (Italy) and Pontificia Universidad Catolica de Chile, Facultad de Fisica, Casilla 306, Santiago 22 (Chile)]. E-mail: fileviez@higgs.fis.puc.cl

2005-01-13

We study in detail the d=6 operators for proton decay in the two possible matter unification scenarios based on SU(5) gauge symmetry. We investigate the way to distinguish between these two scenarios. The dependence of the branching ratios for the two body decays on the fermion mixing is presented in both cases. We point out the possibility to make a clear test of flipped SU(5) through the decay channel p->{pi}{sup +}{nu}-bar , and the ratio {tau}(p->K{sup 0}e{sub {alpha}}{sup +})/{tau}(p->{pi}{sup 0}e{sub {alpha}}{sup +})

String threshold corrections and flipped SU(5)

Energy Technology Data Exchange (ETDEWEB)

Antoniadis, I. (Ecole Polytechnique, Centre de Physique Theorique, 91 - Palaiseau (France) Theory Div., CERN, Geneva (Switzerland)); Ellis, J. (Theory Div., CERN, Geneva (Switzerland)); Lacaze, R. (Service de Physique Theorique, CEN-Saclay, 91 - Gif-sur-Yvette (France)); Nanopoulos, D.V. (Center for Theoretical Physics, Dept. of Physics, Texas A and M Univ., College Station, TX (United States) Astroparticle Physics Group, HARC, The Woodlands, TX (United States) Theory Div., CERN, Geneva (Switzerland))

1991-10-10

We revise previous calculations of the effective unification scale m{sub SU} at which the extrapolated low-energy gauge couplings should appear to become equal, and we show explicitly how to calculate m{sub SU} in the fermionic construction of four-dimensional strings. In the case of the flipped SU(5) GUT derived from the string, the SU(5) and U(1) couplings defined in the anti Danti R scheme become equal to g{sub SU} at m{sub SU} {approx equal} 1.76 x g{sub SU} x 10{sup 18} GeV. This scale is significantly larger than m{sub GUT}, the scale at which the low-energy SU(3) and SU(2) couplings become equal if extrapolated using the renormalization group equations of the minimal supersymmetric extension of the standard model. The existence of an intermediate SU(5) x U(1) phase could have an observable effect on the calculated value of sin{sup 2}{theta}{sub w}. (orig.).

One-instanton test of a Seiberg-Witten curve from M-theory: the antisymmetric representation of SU(N)

International Nuclear Information System (INIS)

Naculich, S.G.; Schnitzer, H.J.

1998-01-01

One-instanton predictions are obtained from the Seiberg-Witten curve derived from M-theory by Landsteiner and Lopez for the Coulomb branch of N=2 supersymmetric SU(N) gauge theory with a matter hypermultiplet in the antisymmetric representation. Since this cubic curve describes a Riemann surface that is non-hyperelliptic, a systematic perturbation expansion about a hyperelliptic curve is developed, with a comparable expansion for the Seiberg-Witten differential. Calculation of the period integrals of the SW differential by the method of residues of D'Hoker, Krichever, and Phong enables us to compute the prepotential explicitly to one-instanton order. It is shown that the one-instanton predictions for SU(2), SU(3), and SU(4) agree with previously available results. For SU(N), N≥5, our analysis provides explicit predictions of a curve derived from M-theory at the one-instanton level in field theory. (orig.)

[SU(2)]3 dark matter

Science.gov (United States)

Ma, Ernest

2018-05-01

An extra SU(2)D gauge factor is added to the well-known left-right extension of the standard model (SM) of quarks and leptons. Under SU(2)L × SU(2)R × SU(2)D, two fermion bidoublets (2 , 1 , 2) and (1 , 2 , 2) are assumed. The resulting model has an automatic dark U (1) symmetry, in the same way that the SM has automatic baryon and lepton U (1) symmetries. Phenomenological implications are discussed, as well as the possible theoretical origins of this proposal.

El medioambiente y su salud

Science.gov (United States)

Las acciones que usted toda en su diario vivir tienen un impacto en su medioambiente y su salud. La Agencia de Protección Ambiental de EE.UU. (EPA, por sus siglas en inglés) ofrece información sobre los pasos que puede tomar para protegerse a usted y prote

Standard model fermions and N=8 supergravity

Energy Technology Data Exchange (ETDEWEB)

Nicolai, Hermann [Max Planck Institute for Gravitational Physics (Albert Einstein Institute), Am Muehlenberg 1, Potsdam-Golm (Germany)

2016-07-01

In a scheme originally proposed by Gell-Mann, and subsequently shown to be realized at the SU(3) x U(1) stationary point of maximal gauged SO(8) supergravity, the 48 spin-1/2 fermions of the theory remaining after the removal of eight Goldstinos can be identified with the 48 quarks and leptons (including right-chiral neutrinos) of the Standard model, provided one identifies the residual SU(3) with the diagonal subgroup of the color group SU(3){sub c} and a family symmetry SU(3){sub f}. However, there remained a systematic mismatch in the electric charges by a spurion charge of ± 1/6. We here identify the ''missing'' U(1) that rectifies this mismatch, and that takes a surprisingly simple, though unexpected form, and show how it is related to the conjectured R symmetry K(E10) of M Theory.

Fabrication of a roller type PDMS stamp using SU-8 concave molds and its application for roll contact printing

International Nuclear Information System (INIS)

Park, Jongho; Kim, Beomjoon

2016-01-01

Continuous fabrication of micropatterns at low-cost is attracting attention in various applications within industrial fields. To meet such demands, we have demonstrated a roll contact printing technique, using roller type polydimethylsiloxane (PDMS) stamps with roll-to-flat and roll-to-roll stages. Roller type PDMS stamps for roll contact printing were fabricated using a custom-made metal support and SU-8 microstructures fabricated on concave substrates as a mold. The molding/casting method which we developed here provided faster and easier fabrication than conventional methods for roller type stamps. Next, roll contact printing was performed using fabricated roller type PDMS stamps with roll-to-flat and roll-to-roll stages. Patterns with minimum widths of 3 μm and 2.1 μm were continuously fabricated for each stage, respectively. In addition, the relationship between applied pressures and dimensional changes of roll contact printed patterns was investigated. Finally, we confirmed that roll contact printing and the new fabrication method for roller stamps presented in this study demonstrated the feasibility for industrial applications. (paper)

Masking considerations in chemically assisted ion beam etching of GaAs/AlGaAs laser structures

International Nuclear Information System (INIS)

Behfar-Rad, A.; Wong, S.S.; Davis, R.J.; Wolf, E.D.; Cornell Univ., Ithaca, NY

1989-01-01

The use of photoresist, Cr, and SiO 2 as etch masks for GaAs/AlGaAs structures in chemically assisted ion beam etching is reported. The optimized etch with a photoresist mask results in a high degree of anisotropy and smooth sidewalls. However, the etched surface contains undesirable features. The etch with a Cr mask is also highly anisotropic, and the etched surface is free of features. The drawback with Cr masks is that the sidewalls are rough. Vertical and smooth sidewalls as well as a featureless surface are obtained with a SiO 2 mask. The SiO 2 mask has been employed to etch the facets of monolithic GaAs/AlGaAs-based laser structures

SU(2)xSU(2) coupling rule and a tensor glueball candidate

International Nuclear Information System (INIS)

Lanik, J.

1984-01-01

The data on the decay of THETA(1640) particles are considered. It is shown that the SU(2)xSU(2) mechanism for coupling of theta(1640) tensor glueball candidate to pseudoscalar Gold-stone mesons is in a remarkable agreement with existing experimental data

Flipped SU(5) from Z{sub 12-I} orbifold with Wilson line

Energy Technology Data Exchange (ETDEWEB)

Kim, Jihn E. [Department of Physics and Astronomy, and Center for Theoretical Physics, Seoul National University, Seoul 151-747 (Korea, Republic of)]. E-mail: jekim@phyp.snu.ac.kr; Kyae, Bumseok [School of Physics, Korea Institute for Advanced Study, 207-43 Cheongryangri-dong, Dongdaemun-gu, Seoul 130-722 (Korea, Republic of)]. E-mail: bkyae@kias.re.kr

2007-05-14

We construct a three family flipped SU(5) model from the heterotic string theory compactified on the Z{sub 12-I} orbifold with one Wilson line. The gauge group is SU(5)xU(1){sub X}xU(1){sup 3}x[SU(2)xSO(10)xU(1){sup 2}]{sup '}. This model does not derive any non-Abelian group except SU(5) from E{sub 8}, which is possible only for two cases in case of one shift V, one in Z{sub 12-I} and the other in Z{sub 12-II}. We present all possible Yukawa couplings. We place the third quark family in the twisted sectors and two light quark families in the untwisted sector. From the Yukawa couplings, the model provides the R-parity, the doublet-triplet splitting, and one pair of Higgs doublets. It is also shown that quark and lepton mixings are possible. So far we have not encountered a serious phenomenological problem. There exist vector-like flavor SU(5) exotics (including Q{sub em}=+/-16 color exotics and Q{sub em}=+/-12 electromagnetic exotics) and SU(5) vector-like singlet exotics with Q{sub em}=+/-12 which can be removed near the GUT scale. In this model, sin{sup 2}{theta}{sub W}{sup 0}=38 at the full unification scale.

Structure of stable degeneration of K3 surfaces into pairs of rational elliptic surfaces

Science.gov (United States)

Kimura, Yusuke

2018-03-01

F-theory/heterotic duality is formulated in the stable degeneration limit of a K3 fibration on the F-theory side. In this note, we analyze the structure of the stable degeneration limit. We discuss whether stable degeneration exists for pairs of rational elliptic surfaces. We demonstrate that, when two rational elliptic surfaces have an identical complex structure, stable degeneration always exists. We provide an equation that systematically describes the stable degeneration of a K3 surface into a pair of isomorphic rational elliptic surfaces. When two rational elliptic surfaces have different complex structures, whether their sum glued along a smooth fiber admits deformation to a K3 surface can be determined by studying the structure of the K3 lattice. We investigate the lattice theoretic condition to determine whether a deformation to a K3 surface exists for pairs of extremal rational elliptic surfaces. In addition, we discuss the configurations of singular fibers under stable degeneration. The sum of two isomorphic rational elliptic surfaces glued together admits a deformation to a K3 surface, the singular fibers of which are twice that of the rational elliptic surface. For special situations, singular fibers of the resulting K3 surface collide and they are enhanced to a fiber of another type. Some K3 surfaces become attractive in these situations. We determine the complex structures and the Weierstrass forms of these attractive K3 surfaces. We also deduce the gauge groups in F-theory compactifications on these attractive K3 surfaces times a K3. E 6, E 7, E 8, SU(5), and SO(10) gauge groups arise in these compactifications.

Center vortex model for the infrared sector of SU(4) Yang-Mills theory: String tensions and deconfinement transition

International Nuclear Information System (INIS)

Engelhardt, M.

2006-01-01

A random vortex world-surface model for the infrared sector of SU(4) Yang-Mills theory is constructed, focusing on the confinement properties and the behavior at the deconfinement phase transition. Although the corresponding data from lattice Yang-Mills theory can be reproduced, the model requires a more complex action and considerably more tuning than the SU(2) and SU(3) cases studied previously. Its predictive capabilities are accordingly reduced. This behavior has a definite physical origin, which is elucidated in detail in the present work. As the number of colors is raised in Yang-Mills theory, the corresponding infrared effective vortex description cannot indefinitely continue to rely on dynamics determined purely by vortex world-surface characteristics; additional color structures present on the vortices begin to play a role. As evidenced by the modeling effort reported here, definite signatures of this behavior appear in the case of four colors

Study of Λ parameters and crossover phenomena in SU(N) x SU(N) sigma models in two dimensions

International Nuclear Information System (INIS)

Shigemitsu, J.; Kogut, J.B.

1981-01-01

The spin system analogues of recent studies of the string tension and Λ parameters of SU(N) gauge theories in 4 dimensions are carried out for the SU(N) x SU(N) and O(N) models in 2 dimensions. The relations between the Λ parameters of both the Euclidean and Hamiltonian formulation of the lattice models and the Λ parameter of the continuum models are obtained. The one loop finite renormalization of the speed of light in the lattice Hamiltonian formulations of the O(N) and SU(N) x SU(N) models is calculated. Strong coupling calculations of the mass gaps of these spin models are done for all N and the constants of proportionality between the gap and the Λ parameter of the continuum models are obtained. These results are contrasted with similar calculations for the SU(N) gauge models in 3+1 dimensions. Identifying suitable coupling constants for discussing the N → infinity limits, the numerical results suggest that the crossover from weak to strong coupling in the lattice O(N) models becomes less abrupt as N increases while the crossover for the SU(N) x SU(N) models becomes more abrupt. The crossover in SU(N) gauge theories also becomes more abrupt with increasing N, however, at an even greater rate than in the SU(N) x SU(N) spin models

Investigation of UFO defect on DUV CAR and BARC process

Science.gov (United States)

Yet, Siew Ing; Ko, Bong Sang; Lee, Soo Man; May, Mike

2004-05-01

Photo process defect reduction is one of the most important factors to improve the process stability and yield in sub-0.18um DUV process. In this paper, a new approach to minimize the Deep-UV (DUV) Chemically Amplified Resist (CAR) and Bottom Anti-Reflective Coating (BARC) induced defect known as UFO (UnidentiFied Object) defect will be introduced. These defects have mild surface topography difference on BARC; it only exists on the wide exposed area where there is no photoresist pattern. In this test, Nikon KrF Stepper & Scanner and TEL Clean track were used. Investigation was carried out on the defect formulation on both Acetal and ESCAP type of photoresist while elemental analysis was done by Atomic Force Microscope (AFM) & Auger Electron Spectroscopy (AES). Result indicated that both BARC and photoresist induce this UFO defect; total defect quantity is related with Post Exposure Bake (PEB) condition. Based on the elemental analysis and process-split test, we can conclude that this defect is caused by lack of acid amount and low diffusivity which is related to PAG (Photo Acid Generator) and TAG (Thermal Acid Generator) in KrF photoresist and BARC material. By optimizing photoresist bake condition, this UFO defect as well as other related defect such as Satellite defect could be eliminated.

Polymeric cantilever-based biosensors with integrated readout

DEFF Research Database (Denmark)

Johansson, Alicia; Blagoi, Gabriela; Boisen, Anja

2006-01-01

The authors present an SU-8 cantilever chip with integrated piezoresistors for detection of surface stress changes due to adsorption of biomolecules on the cantilever surface. Mercaptohexanol is used as a model biomolecule to study molecular interactions with Au-coated SU-8 cantilevers and surfac...

Entropy of entangled states and SU(1,1) and SU(2) symmetries

International Nuclear Information System (INIS)

Santana, A.E.; Khanna, F.C.; Revzen, M.

2002-01-01

Based on a recent definition of a measure for entanglement [Plenio and Vedral, Contemp. Phys. 39, 431 (1998)], examples of maximum entangled states are presented. The construction of such states, which have symmetry SU(1,1) and SU(2), follows the guidance of thermofield dynamics formalism

Derivation of Land Surface Temperature for Landsat-8 TIRS Using a Split Window Algorithm

Directory of Open Access Journals (Sweden)

Offer Rozenstein

2014-03-01

Full Text Available Land surface temperature (LST is one of the most important variables measured by satellite remote sensing. Public domain data are available from the newly operational Landsat-8 Thermal Infrared Sensor (TIRS. This paper presents an adjustment of the split window algorithm (SWA for TIRS that uses atmospheric transmittance and land surface emissivity (LSE as inputs. Various alternatives for estimating these SWA inputs are reviewed, and a sensitivity analysis of the SWA to misestimating the input parameters is performed. The accuracy of the current development was assessed using simulated Modtran data. The root mean square error (RMSE of the simulated LST was calculated as 0.93 °C. This SWA development is leading to progress in the determination of LST by Landsat-8 TIRS.

ROGERS SU PENSAMIENTO PROFESIONAL Y SU FILOSOFÍA PERSONAL

Directory of Open Access Journals (Sweden)

Gina Pezzano de Vengoechea

2001-01-01

Full Text Available Carl Rogers denominó a su enfoque psicológico «Psicoterapia centrada en el cliente» y se asocia a la Psicología Humanista, que dignifica y valora el esfuerzo de la persona por desarrollar sus potencialidades. En esta ponencia se describen las ventajas y alcances de este enfoque, así como las limitaciones que muestra su empleo en medios socioeconómicos en desventaja. De igual manera, se analizan las enseñanzas más significativas de este psicoterapeuta acerca de las relaciones entre los individuos.

The design study of the JT-60SU device. No.8. Nuclear shielding and safety design

Energy Technology Data Exchange (ETDEWEB)

Miya, Naoyuki; Kikuchi, Mitsuru; Ushigusa, Kenkichi [Japan Atomic Energy Research Inst., Naka, Ibaraki (Japan). Naka Fusion Research Establishment] [and others

1998-03-01

Results of nuclear shielding design study and safety analysis for the steady-state tokamak device JT-60SU are described. D-T operation (option) for two years is adopted in addition to ten years operation using deuterium. Design work has been done in accordance with general laws for radioisotopes handling in Japan as a guideline of safety evaluation, which is applied to the operation of present JT-60U device. Optimization of the shielding design for the device structure including vacuum vessel has been presented to meet with allowable limits of biological shielding determined in advance. It is shown that JT-60SU can be operated safely in the present JT-60 experimental building. It is planed to use 100g/year of tritium in D-T operation phase. A concept of multiple -barrier system is applied to the facility design to prevent propagation of tritium, in which the torus hall and the tritium removal room provide the tertiary confinement. From the design of atmosphere detritiation system for accidental tritium release, it is shown that tritium concentration level can be reduced to the allowable level after two weeks with reasonable compact size components. Safety assessment related to activation of coolant/air, and atmospheric tritium effluents are discussed. (author)

Surface phonons on Bi2Sr2CaCu2O8+δ

Science.gov (United States)

Phelps, R. B.; Akavoor, P.; Kesmodel, L. L.; Demuth, J. E.; Mitzi, D. B.

1993-11-01

We report measurements of surface optical phonons on Bi2Sr2CaCu2O8+δ with high-resolution electron-energy-loss spectroscopy (HREELS). In addition to peaks near 50 and 80 meV (403 and 645 cm-1), which have been previously observed, our loss spectra exhibit a peak at 26 meV (210 cm-1). Loss spectra were measured at temperatures from 45 to 146 K, and the temperature dependence of the peaks was found to be weak. The 50 and 80 meV peaks shift to lower frequency by ~1.5 meV over this temperature range. All three peaks are attributed to surface optical phonons. The identification of particular bulk modes corresponding to the surface modes observed with HREELS is discussed.

Balanced Hermitian metrics from SU(2)-structures

International Nuclear Information System (INIS)

Fernandez, M.; Tomassini, A.; Ugarte, L.; Villacampa, R.

2009-01-01

We study the intrinsic geometrical structure of hypersurfaces in six-manifolds carrying a balanced Hermitian SU(3)-structure, which we call balanced SU(2)-structure. We provide sufficient conditions, in terms of suitable evolution equations, which imply that a five-manifold with such structure can be isometrically embedded as a hypersurface in a balanced Hermitian SU(3)-manifold. Any five-dimensional compact nilmanifold has an invariant balanced SU(2)-structure, and we show how some of them can be evolved to give new explicit examples of balanced Hermitian SU(3)-structures. Moreover, for n=3,4, we present examples of compact solvmanifolds endowed with a balanced SU(n)-structure such that the corresponding Bismut connection has holonomy equal to SU(n)

Performance evaluation for different sensing surface of BICELLs bio-transducers for dry eye biomarkers

Science.gov (United States)

Laguna, M. F.; Holgado, M.; Santamaría, B.; López, A.; Maigler, M.; Lavín, A.; de Vicente, J.; Soria, J.; Suarez, T.; Bardina, C.; Jara, M.; Sanza, F. J.; Casquel, R.; Otón, A.; Riesgo, T.

2015-03-01

Biophotonic Sensing Cells (BICELLs) are demonstrated to be an efficient technology for label-free biosensing and in concrete for evaluating dry eye diseases. The main advantage of BICELLs is its capability to be used by dropping directly a tear into the sensing surface without the need of complex microfluidics systems. Among this advantage, compact Point of Care read-out device is employed with the capability of evaluating different types of BICELLs packaged on Biochip-Kits that can be fabricated by using different sensing surfaces material. In this paper, we evaluate the performance of the combination of three sensing surface materials: (3-Glycidyloxypropyl) trimethoxysilane (GPTMS), SU-8 resist and Nitrocellulose (NC) for two different biomarkers relevant for dry eye diseases: PRDX-5 and ANXA-11.

Remarks on broken chiral SU(5) x SU(5) symmetry and B mesons

International Nuclear Information System (INIS)

Kim, D.Y.; Sinha, S.N.

1985-01-01

In a recent paper, Hatzis has estimated the masses and weak decay constants of b-flavored pseudoscalar mesons in a broken chiral SU(5) x SU(5) symmetry method. The estimated weak decay constant of B meson, f sub(B) f sub(K)(f sub(B)/f sub(K) approximately equal to 1.4) evaluated by Mathur et al. with the quantum chromodynamics (QCD) sum-rule model. We re-examined the problem applying the broken chiral SU(5) x SU(5) symmetry approach using a set of mass formulae. With this method we estimate the symmetry-breaking parameters and decay constants of pseudoscalar mesons. We found a consistent result for the decay constant: f sub(K) < or approximately equal to f sub(D) < or approximately equal to f sub(B). The explicit numerical value of these constants, however, are lower than that of the QCD sum rule. This may be due to the limited validity of the broken chiral symmetry approach for heavy mesons

SU(5) unification revisited

International Nuclear Information System (INIS)

Giveon, A.; Sarid, U.; Hall, L.J.; California Univ., Berkeley, CA

1991-01-01

Model-independent criteria for unification in the SU(5) framework are studied. These are applied to the minimal supersymmetric standard model and to the standard model with a split 45 Higgs representation. Although the former is consistent with SU(5) unification, the superpartner masses can vary over a wide range, and may even all lie well beyond the reach of planned colliders. Adding a split 45 to the standard model can also satisfy the unification criteria, so supersymmetric SU(5) is far from unique. Furthermore, we learn that separate Higgs doublets must couple to the top and bottom quarks in order to give a correct m b /m τ prediction. (orig.)

Surface phonons on Bi2Sr2CaCu2O8+δ

International Nuclear Information System (INIS)

Phelps, R.B.; Akavoor, P.; Kesmodel, L.L.; Demuth, J.E.; Mitzi, D.B.

1993-01-01

We report measurements of surface optical phonons on Bi 2 Sr 2 CaCu 2 O 8+δ with high-resolution electron-energy-loss spectroscopy (HREELS). In addition to peaks near 50 and 80 meV (403 and 645 cm -1 ), which have been previously observed, our loss spectra exhibit a peak at 26 meV (210 cm -1 ). Loss spectra were measured at temperatures from 45 to 146 K, and the temperature dependence of the peaks was found to be weak. The 50 and 80 meV peaks shift to lower frequency by ∼1.5 meV over this temperature range. All three peaks are attributed to surface optical phonons. The identification of particular bulk modes corresponding to the surface modes observed with HREELS is discussed

Vortices in the SU(N) x SU(N) spin systems in two dimensions

International Nuclear Information System (INIS)

Kares, R.J.D.

1982-01-01

The SU(N) x SU(N) or chiral spin systems in two dimensions with spin variables in both the fundamental and the adjoint representations of SU(N) are considered. In the adjoint representation the chiral models are found to possess topologically stable, classical vortex solutions which carry a Z(N) topological charge. A relationship is established between the chiral models and massive Yang-Mills theory in two dimensions. This relationship is exploited to prove the asymptotic freedom of the chiral models and to find their weak coupling mass gap. The connection between the vortices of the chiral models and those of the massive Yang-Mills theory is discussed. The behavior of a gas of vortices in the SU(2) chiral model is considered. This gas is converted to an equivalent field theory and studied using the renormalization group. It is shown that the SU(2) vortex gas does not undergo a Kosterlitz-Thouless phase transition. This behavior probably persists for the higher SU(N) groups as well. Finally, using the massive Yang-Mills theory the effect of the coupling of vortices to spin wave fluctuations is investigated. It is argued that as a result of the vortex-spin wave interaction the vortices acquire a mass scale dynamically. A self consistency condition is derived for the vortex scale and used to compute the mass gap for the chiral models in the presence of vortices. The mass gap obtained in this way is found to be in agreement with the weak coupling result suggesting that vortices may be responsible for generating the mass gap in the chiral models near T = 0

Grayscale lithography-automated mask generation for complex three-dimensional topography

Science.gov (United States)

Loomis, James; Ratnayake, Dilan; McKenna, Curtis; Walsh, Kevin M.

2016-01-01

Grayscale lithography is a relatively underutilized technique that enables fabrication of three-dimensional (3-D) microstructures in photosensitive polymers (photoresists). By spatially modulating ultraviolet (UV) dosage during the writing process, one can vary the depth at which photoresist is developed. This means complex structures and bioinspired designs can readily be produced that would otherwise be cost prohibitive or too time intensive to fabricate. The main barrier to widespread grayscale implementation, however, stems from the laborious generation of mask files required to create complex surface topography. We present a process and associated software utility for automatically generating grayscale mask files from 3-D models created within industry-standard computer-aided design (CAD) suites. By shifting the microelectromechanical systems (MEMS) design onus to commonly used CAD programs ideal for complex surfacing, engineering professionals already familiar with traditional 3-D CAD software can readily utilize their pre-existing skills to make valuable contributions to the MEMS community. Our conversion process is demonstrated by prototyping several samples on a laser pattern generator-capital equipment already in use in many foundries. Finally, an empirical calibration technique is shown that compensates for nonlinear relationships between UV exposure intensity and photoresist development depth as well as a thermal reflow technique to help smooth microstructure surfaces.

Integrable multi parametric SU(N) chain

International Nuclear Information System (INIS)

Foerster, Angela; Roditi, Itzhak; Rodrigues, Ligia M.C.S.

1996-03-01

We analyse integrable models associated to a multi parametric SU(N) R-matrix. We show that the Hamiltonians describe SU(N) chains with twisted boundary conditions and that the underlying algebraic structure is the multi parametric deformation of SU(N) enlarged by the introduction of a central element. (author). 15 refs

Finite size giant magnons in the SU(2) x SU(2) sector of AdS4 x CP3

International Nuclear Information System (INIS)

Lukowski, Tomasz; Sax, Olof Ohlsson

2008-01-01

We use the algebraic curve and Luescher's μ-term to calculate the leading order finite size corrections to the dispersion relation of giant magnons in the SU(2) x SU(2) sector of AdS 4 x CP 3 . We consider a single magnon as well as one magnon in each SU(2). In addition the algebraic curve computation is generalized to give the leading order correction for an arbitrary multi-magnon state in the SU(2) x SU(2) sector.

Analysis list: Su(var)205 [Chip-atlas[Archive

Lifescience Database Archive (English)

Full Text Available Su(var)205 Adult,Embryo,Larvae + dm3 http://dbarchive.biosciencedbc.jp/kyushu-u/dm3.../target/Su(var)205.1.tsv http://dbarchive.biosciencedbc.jp/kyushu-u/dm3/target/Su(var)205.5.tsv http://dbarc...hive.biosciencedbc.jp/kyushu-u/dm3/target/Su(var)205.10.tsv http://dbarchive.biosciencedbc.jp/kyushu-u/dm3/c...olo/Su(var)205.Adult.tsv,http://dbarchive.biosciencedbc.jp/kyushu-u/dm3/colo/Su(var)205.Embryo.tsv,http:...//dbarchive.biosciencedbc.jp/kyushu-u/dm3/colo/Su(var)205.Larvae.tsv http://dbarchive

An Improved Single-Channel Method to Retrieve Land Surface Temperature from the Landsat-8 Thermal Band

Directory of Open Access Journals (Sweden)

Jordi Cristóbal

2018-03-01

Full Text Available Land surface temperature (LST is one of the sources of input data for modeling land surface processes. The Landsat satellite series is the only operational mission with more than 30 years of archived thermal infrared imagery from which we can retrieve LST. Unfortunately, stray light artifacts were observed in Landsat-8 TIRS data, mostly affecting Band 11, currently making the split-window technique impractical for retrieving surface temperature without requiring atmospheric data. In this study, a single-channel methodology to retrieve surface temperature from Landsat TM and ETM+ was improved to retrieve LST from Landsat-8 TIRS Band 10 using near-surface air temperature (Ta and integrated atmospheric column water vapor (w as input data. This improved methodology was parameterized and successfully evaluated with simulated data from a global and robust radiosonde database and validated with in situ data from four flux tower sites under different types of vegetation and snow cover in 44 Landsat-8 scenes. Evaluation results using simulated data showed that the inclusion of Ta together with w within a single-channel scheme improves LST retrieval, yielding lower errors and less bias than models based only on w. The new proposed LST retrieval model, developed with both w and Ta, yielded overall errors on the order of 1 K and a bias of −0.5 K validated against in situ data, providing a better performance than other models parameterized using w and Ta or only w models that yielded higher error and bias.

Dimensional reduction of exceptional E6,E8 gauge groups and flavour chirality

International Nuclear Information System (INIS)

Koca, M.

1984-01-01

Ten-dimensional Yang - Mills gauge theories based on the exceptional groups E 6 and E 8 are reduced to four-dimensional flavour-chiral Yang - Mills - Higgs theories where the extra six dimensions are identified with the compact G 2 /SU(3) and SO(7)/SO(6) coset spaces. A ten-dimensional E 8 theory leads to three families of SU(5), one of which lies in the 144-dimensional representation of SO(10)

Fabrication and surface characterization of photopatterned encapsulated micromagnets for microrobotics and microfluidics applications

Science.gov (United States)

Li, Hui; Leachman, William; Kershaw, Joe

2016-11-01

In this paper, encapsulated micromagnets with magnetic core surrounded by pure SU-8 were fabricated utilizing multilayer photolithography with a middle NdFeB magnetic composite layer. Various geometries of micromagnets were fabricated with high density magnetic core and high resolution features, showing magnetically response while still being biocompatible and chemically resistant and making them suitable for a wide range of microrobotics and microfluidics applications. Especially, crescent and C-channel micromagnets showed potential of microtransportation devices because of their interior reservoirs. Surface characterization of the micromagnets was conducted using closed-form solutions derived from the general biplanar surface characterization method. The fabrication method was evaluated and the process errors were found less than 1%.

SU-F-J-19: Robust Region-Of-Interest (ROI) for Consistent Registration On Deteriorated Surface Images

Energy Technology Data Exchange (ETDEWEB)

Kang, H; Malin, M; Chmura, S; Hasan, Y; Al-Hallaq, H [The Department of Radiation and Cellular Oncology, The University of Chicago Medicine, Chicago, IL (United States)

2016-06-15

Purpose: For African-American patients receiving breast radiotherapy with a bolus, skin darkening can affect the surface visualization when using optical imaging for daily positioning and gating at deep-inspiration breath holds (DIBH). Our goal is to identify a region-of-interest (ROI) that is robust against deteriorating surface image quality due to skin darkening. Methods: We study four patients whose post-mastectomy surfaces are imaged daily with AlignRT (VisionRT, UK) for DIBH radiotherapy and whose surface image quality is degraded toward the end of treatment. To simulate the effects of skin darkening, surfaces from the first ten fractions of each patient are systematically degraded by 25–35%, 40–50% and 65–75% of the total area of the clinically used ROI-ipsilateral-chestwall. The degraded surfaces are registered to the reference surface in six degrees-of-freedom. To identify a robust ROI, three additional reference ROIs — ROI-chest+abdomen, ROI-bilateral-chest and ROI-extended-ipsilateral-chestwall are created and registered to the degraded surfaces. Differences in registration using these ROIs are compared to that using ROI-ipsilateral-chestwall. Results: For three patients, the deviations in the registrations to ROI-ipsilateral-chestwall are > 2.0, 3.1 and 7.9mm on average for 25–35%, 40–50% and 65–75% degraded surfaces, respectively. Rotational deviations reach 11.1° in pitch. For the last patient, registration is consistent to within 2.6mm even on the 65–75% degraded surfaces, possibly because the surface topography has more distinct features. For ROI-bilateral-chest and ROI-extended-ipsilateral-chest registrations deviate in a similar pattern. However, registration on ROI-chest+abdomen is robust to deteriorating image qualities to within 4.2mm for all four patients. Conclusion: Registration deviations using ROI-ipsilateral-chestwall can reach 9.8mm on the 40–50% degraded surfaces. Caution is required when using AlignRT for patients

Phenomenology with supersymmetric flipped SU(6)

Energy Technology Data Exchange (ETDEWEB)

Shafi, Qaisar E-mail: shafi@bartol.udel.edu; Tavartkiladze, Zurab E-mail: tavzur@axpfe1.fe.infn.it

1999-07-12

The supersymmetric flipped SU(6) x U(1) gauge symmetry can arise through compactification of the ten-dimensional E{sub 8} x E{sub 8} superstring theory. We show how realistic phenomenology can emerge from this theory by supplementing it with the symmetry R x U(1), where R denotes a discrete 'R'-symmetry. The well-known doublet-triplet splitting problem is resolved to 'all orders' via the pseudo-Goldstone mechanism, and the GUT scale arises from an interplay of the Planck and supersymmetry breaking scales. The symmetry R x U(1) is also important for understanding the fermion mass hierarchies as well as the magnitudes of the CKM matrix elements. Furthermore, the well-known MSSM parameter tan {beta} is estimated to be of order unity, while the proton lifetime ({tau}{sub p} {approx} 10{sup 2}{tau}{sub pSU(5)}) is consistent with observations. Depending on some parameters, p {yields} K{mu}{sup +} can be the dominant decay mode. Finally, the observed solar and atmospheric neutrino 'anomalies' requir us to introduce a 'sterile' neutrino state. Remarkably, the R x U(1) symmetry protects it from becoming heavy, so that maximal angle {nu}{sub {mu}} oscillations into a sterile state can explain the atmospheric anomaly, while the solar neutrino puzzle is resolved via the small angle {nu}{sub e} - {nu}{sub {tau}} MSW oscillations. The existence of some ({approx} 15-20% of critical energy density) neutrino hot dark matter is also predicted.

Closed flux tubes in D=2+1SU(N) gauge theories: dynamics and effective string description

Energy Technology Data Exchange (ETDEWEB)

Athenodorou, Andreas [Department of Physics, University of Cyprus,POB 20537, 1678 Nicosia (Cyprus); Computation-based Science and Technology Research Center, The Cyprus Institute,20 Kavafi Str., Nicosia 2121 (Cyprus); Teper, Michael [Rudolf Peierls Centre for Theoretical Physics, University of Oxford,1 Keble Road, Oxford OX1 3NP (United Kingdom)

2016-10-18

We extend our earlier calculations of the spectrum of closed flux tubes in SU(N) gauge theories in 2+1 dimensions, with a focus on questions raised by recent theoretical progress on the effective string action of long flux tubes and the world-sheet action for flux tubes of moderate lengths. Our new calculations in SU(4) and SU(8) provide evidence that the leading O(1/l{sup γ}) non-universal correction to the flux tube ground state energy does indeed have a power γ≥7. We perform a study in SU(2), where we can traverse the length at which the Nambu-Goto ground state becomes tachyonic, to obtain an all-N view of the spectrum. Our comparison of the k=2 flux tube excitation energies in SU(4) and SU(6) suggests that the massive world sheet excitation associated with the k=2 binding has a scale that knows about the group and hence the theory in the bulk, and we comment on the potential implications of world sheet massive modes for the bulk spectrum. We provide a quantitative analysis of the surprising (near-)orthogonality of flux tubes carrying flux in different SU(N) representations, which implies that their screening by gluons is highly suppressed even at small N.

Closed flux tubes in D=2+1SU(N) gauge theories: dynamics and effective string description

International Nuclear Information System (INIS)

Athenodorou, Andreas; Teper, Michael

2016-01-01

We extend our earlier calculations of the spectrum of closed flux tubes in SU(N) gauge theories in 2+1 dimensions, with a focus on questions raised by recent theoretical progress on the effective string action of long flux tubes and the world-sheet action for flux tubes of moderate lengths. Our new calculations in SU(4) and SU(8) provide evidence that the leading O(1/l"γ) non-universal correction to the flux tube ground state energy does indeed have a power γ≥7. We perform a study in SU(2), where we can traverse the length at which the Nambu-Goto ground state becomes tachyonic, to obtain an all-N view of the spectrum. Our comparison of the k=2 flux tube excitation energies in SU(4) and SU(6) suggests that the massive world sheet excitation associated with the k=2 binding has a scale that knows about the group and hence the theory in the bulk, and we comment on the potential implications of world sheet massive modes for the bulk spectrum. We provide a quantitative analysis of the surprising (near-)orthogonality of flux tubes carrying flux in different SU(N) representations, which implies that their screening by gluons is highly suppressed even at small N.

Influence of Ecological Factors on Estimation of Impervious Surface Area Using Landsat 8 Imagery